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Sample records for bismuth silicon oxide

  1. Highly ytterbium-doped bismuth-oxide-based fiber.

    PubMed

    Ohara, Seiki; Kuroiwa, Yutaka

    2009-08-01

    Thermally stable highly ytterbium-doped bismuth-oxide-based glasses have been investigated. The absorbance increased linearly with Yb(2)O(3) concentration, reaching 7800 dB/m with 3 mol-% of Yb(2)O(3). An ytterbium-doped bismuth-oxide-based fiber has also been fabricated with a fiber loss of 0.24 dB/m. A fiber laser is also demonstrated, and it shows a slope efficiency of 36%.

  2. Buried oxide layer in silicon

    DOEpatents

    Sadana, Devendra Kumar; Holland, Orin Wayne

    2001-01-01

    A process for forming Silicon-On-Insulator is described incorporating the steps of ion implantation of oxygen into a silicon substrate at elevated temperature, ion implanting oxygen at a temperature below 200.degree. C. at a lower dose to form an amorphous silicon layer, and annealing steps to form a mixture of defective single crystal silicon and polycrystalline silicon or polycrystalline silicon alone and then silicon oxide from the amorphous silicon layer to form a continuous silicon oxide layer below the surface of the silicon substrate to provide an isolated superficial layer of silicon. The invention overcomes the problem of buried isolated islands of silicon oxide forming a discontinuous buried oxide layer.

  3. Degradation of organic dyes via bismuth silver oxide initiated direct oxidation coupled with sodium bismuthate based visible light photocatalysis.

    PubMed

    Yu, Kai; Yang, Shaogui; Liu, Cun; Chen, Hongzhe; Li, Hui; Sun, Cheng; Boyd, Stephen A

    2012-07-01

    Organic dye degradation was achieved via direct oxidation by bismuth silver oxide coupled with visible light photocatalysis by sodium bismuthate. Crystal violet dye decomposition by each reagent proceeded via two distinct pathways, each involving different active oxygen species. A comparison of each treatment method alone and in combination demonstrated that using the combined methods in sequence achieved a higher degree of degradation, and especially mineralization, than that obtained using either method alone. In the combined process direct oxidation acts as a pretreatment to rapidly bleach the dye solution which substantially facilitates subsequent visible light photocatalytic processes. The integrated sequential direct oxidation and visible light photocatalysis are complementary manifesting a > 100% increase in TOC removal, compared to either isolated method. The combined process is proposed as a novel and effective technology based on one primary material, sodium bismuthate, for treating wastewaters contaminated by high concentrations of organic dyes.

  4. Spin dynamics of complex oxides, bismuth-antimony alloys, and bismuth chalcogenides

    NASA Astrophysics Data System (ADS)

    Sahin, Cuneyt

    The emerging field of spintronics relies on the manipulation of electron spin in order to use it in spin-based electronics. Such a paradigm change has to tackle several challenges including finding materials with sufficiently long spin lifetimes and materials which are efficient in generating pure spin currents. This thesis predicts that two types of material families could be a solution to the aforementioned challenges: complex oxides and bismuth based materials. We derived a general approach for constructing an effective spin-orbit Hamiltonian which is applicable to all nonmagnetic materials. This formalism is useful for calculating spin-dependent properties near an arbitrary point in momentum space. We also verified this formalism through comparisons with other approaches for III-V semiconductors, and its general applicability is illustrated by deriving the spin-orbit interaction and predicting spin lifetimes for strained strontium titanate (STO) and a two-dimensional electron gas in STO (such as at the LAO/STO interface). Our results suggest robust spin coherence and spin transport properties in STO related materials even at room temperature. In the second part of the study we calculated intrinsic spin Hall conductivities for bismuth-antimony (BISb) semimetals with strong spin-orbit couplings, from the Kubo formula and using Berry curvatures evaluated throughout the Brillouin zone from a tight-binding Hamiltonian. Nearly crossing bands with strong spin-orbit interaction generate giant spin Hall conductivities in these materials, ranging from 474 ((h/e)O--1cm--1) for bismuth to 96((h/e)O--1cm --1) for antimony; the value for bismuth is more than twice that of platinum. The large spin Hall conductivities persist for alloy compositions corresponding to a three-dimensional topological insulator state, such as Bi0.83Sb0.17. The spin Hall conductivity could be changed by a factor of 5 for doped Bi, or for Bi0.83Sb0.17, by changing the chemical potential by 0.5 e

  5. [Efficient oxidative degradation of tetrabromobisphenol A by silver bismuth oxide].

    PubMed

    Chen, Man-tang; Song, Zhou; Wang, Nan; Ding, Yao-bin; Liao, Hai-xing; Zhu, Li-hua

    2015-01-01

    Silver bismuth oxide(BSO) was prepared by a simple ion exchange-coprecipitation method with AgNO3 and NaBiO, .2H2O as raw materials, and then used to oxidatively degrade tetrabromobisphenol A(TBBPA). Effects of the molar ratio of Ag/Bi during BSO preparation and the BSO dosage on the degradation of TBBPA were investigated. The results showed that under the optimized conditions (i.e., the Ag/Bi molar ratio of 1:1, BSO dosage of 1 g x L(-1), 40 mg x L(-1) of TBBPA was completely degraded and the removal of total organic carbon achieved more than 80% within 7 min. The degradation intermediates of TBBPA were identified by ion chromatography, gas chromatograph-mass spectrometer and X-ray photoelectron spectroscopy. The degradation pathway of TBBPA included the debromination, the cleavage of tert-butyl group and the open epoxidation of benzene ring. Based on a quenching study of NaN3, singlet oxygen was proved to play a dominant role in the TBBPA degradation. PMID:25898666

  6. On the Refinement Mechanism of Silicon in Al-Si-Cu-Zn Alloy with Addition of Bismuth

    NASA Astrophysics Data System (ADS)

    Farahany, Saeed; Ourdjini, Ali; Bakar, Tuty Asma Abu; Idris, Mohd Hasbullah

    2014-01-01

    Obtained results of micro and nano studies reveal that bismuth refines the silicon in which the flake silicon changed to lamellar structure with reduction in twin spacing from 160 to 75 nm. Bismuth segregates towards the inter-dendritic regions and decreases the Al-Si contact angle resulting in suppression of the silicon growth causing refinement of the eutectic structure. Increased recalescence temperature and time confirmed that the refinement effect is attributed to the growth stage.

  7. METHOD OF PREPARING URANIUM, THORIUM, OR PLUTONIUM OXIDES IN LIQUID BISMUTH

    DOEpatents

    Davidson, J.K.; Robb, W.L.; Salmon, O.N.

    1960-11-22

    A method is given for forming compositions, as well as the compositions themselves, employing uranium hydride in a liquid bismuth composition to increase the solubility of uranium, plutonium and thorium oxides in the liquid bismuth. The finely divided oxide of uranium, plutonium. or thorium is mixed with the liquid bismuth and uranium hydride, the hydride being present in an amount equal to about 3 at. %, heated to about 5OO deg C, agitated and thereafter cooled and excess resultant hydrogen removed therefrom.

  8. Bismuth oxide nanotubes-graphene fiber-based flexible supercapacitors

    NASA Astrophysics Data System (ADS)

    Gopalsamy, Karthikeyan; Xu, Zhen; Zheng, Bingna; Huang, Tieqi; Kou, Liang; Zhao, Xiaoli; Gao, Chao

    2014-07-01

    Graphene-bismuth oxide nanotube fiber as electrode material for constituting flexible supercapacitors using a PVA/H3PO4 gel electrolyte is reported with a high specific capacitance (Ca) of 69.3 mF cm-2 (for a single electrode) and 17.3 mF cm-2 (for the whole device) at 0.1 mA cm-2, respectively. Our approach opens the door to metal oxide-graphene hybrid fibers and high-performance flexible electronics.Graphene-bismuth oxide nanotube fiber as electrode material for constituting flexible supercapacitors using a PVA/H3PO4 gel electrolyte is reported with a high specific capacitance (Ca) of 69.3 mF cm-2 (for a single electrode) and 17.3 mF cm-2 (for the whole device) at 0.1 mA cm-2, respectively. Our approach opens the door to metal oxide-graphene hybrid fibers and high-performance flexible electronics. Electronic supplementary information (ESI) available: Equations and characterization. SEM images of GGO, XRD and XPS of Bi2O3 NTs, HRTEM images and EDX Spectra of Bi2O3 NT5-GF, CV curves of Bi2O3NT5-GF, Bi2O3 NTs and bismuth nitrate in three-electrode system (vs. Ag/AgCl). CV and GCD curves of Bi2O3 NT1-GF and Bi2O3 NT3-GF. See DOI: 10.1039/c4nr02615b

  9. Oxidation resistance of silicon ceramics

    NASA Technical Reports Server (NTRS)

    Yasutoshi, H.; Hirota, K.

    1984-01-01

    Oxidation resistance, and examples of oxidation of SiC, Si3N4 and sialon are reviewed. A description is given of the oxidation mechanism, including the oxidation product, oxidation reaction and the bubble size. The oxidation reactions are represented graphically. An assessment is made of the oxidation process, and an oxidation example of silicon ceramics is given.

  10. Peculiarities of jumping electroconductivity in bismuth oxide films

    NASA Astrophysics Data System (ADS)

    Vidadi, Yu. A.; Guseinov, Ya. Yu.; Bagiev, V. E.; Rafiev, T. Yu.

    1991-11-01

    The electrical properties of bismuth oxide films with direct and alternating current have been studied. A charge carrier transfer is shown to be dominant in these films both at low temperatures and at high frequencies due to the carrier jumps between the localized states with the energy near the Fermi level N( EF). The value of N( EF) at the localization radius α -1 = 8Å, the angular coefficient in Mott's law for jumping conductivity B = 93 K {1}/{4} and the average length of jumping at 230 K, R = 70 Å, have been calculated by two independent methods for τ-Bi 2O 3 films.

  11. Bismuth Oxide Nanoparticles in the Stratosphere

    NASA Technical Reports Server (NTRS)

    Rietmeijer, Frans J. M.; Mackinnon, Ian D. R.

    1997-01-01

    Platey grains of cubic Bi2O3, alpha-Bi2O3, and Bi2O(2.75), nanograins were associated with chondritic porous interplanetary dust particles W7029C1, W7029E5, and 2011C2 that were collected in the stratosphere at 17-19 km altitude. Similar Bi oxide nanograins were present in the upper stratosphere during May 1985. These grains are linked to the plumes of several major volcanic eruptions during the early 1980s that injected material into the stratosphere. The mass of sulfur from these eruptions is a proxy for the mass of stratospheric Bi from which we derive the particle number densities (p/cu m) for "average Bi2O3 nanograins" due to this volcanic activity and those necessary to contaminate the extraterrestrial chondritic porous interplanetary dust particles via collisional sticking. The match between both values supports the idea that Bi2O3 nanograins of volcanic origin could contaminate interplanetary dust particles in the Earth's stratosphere.

  12. Optical pumping and readout of bismuth hyperfine states in silicon for atomic clock applications

    PubMed Central

    Saeedi, K.; Szech, M.; Dluhy, P.; Salvail, J.Z.; Morse, K.J.; Riemann, H.; Abrosimov, N.V.; Nötzel, N.; Litvinenko, K.L.; Murdin, B.N.; Thewalt, M.L.W.

    2015-01-01

    The push for a semiconductor-based quantum information technology has renewed interest in the spin states and optical transitions of shallow donors in silicon, including the donor bound exciton transitions in the near-infrared and the Rydberg, or hydrogenic, transitions in the mid-infrared. The deepest group V donor in silicon, bismuth, has a large zero-field ground state hyperfine splitting, comparable to that of rubidium, upon which the now-ubiquitous rubidium atomic clock time standard is based. Here we show that the ground state hyperfine populations of bismuth can be read out using the mid-infrared Rydberg transitions, analogous to the optical readout of the rubidium ground state populations upon which rubidium clock technology is based. We further use these transitions to demonstrate strong population pumping by resonant excitation of the bound exciton transitions, suggesting several possible approaches to a solid-state atomic clock using bismuth in silicon, or eventually in enriched 28Si. PMID:25990870

  13. Methane oxidative coupling over nonstoichiometric bismuth -tin pyrochlore catalysts

    SciTech Connect

    Mims, C.A.; Hall, R.B.; Lewandowski, J.T.

    1995-05-01

    A series of expanded pyrochlore oxides Bi{sub 2}Sn{sub 2{minus}x}Bi{sub x}O{sub 7{minus}x/2} (O{le} x {le} 0.86) was synthesized and the influence of their composition on their performance as methane coupling catalysts was examined. A trend to higher selectivity and lower activity accompanies increases in x. However, analysis of the kinetic data by a simple procedure which separates the catalyst activity and selectivity shows that all the catalysts have similar intrinsic surface selectivities, independent of composition. The trend in observed selectivity is an indirect effect of variations in activity. The similarity in surface selectivity is attributed to the formation of a bismuth-oxide-rich surface layer in all materials upon heating to reaction temperatures. 47 refs., 10 figs., 1 tab.

  14. Stabilization of elusive silicon oxides.

    PubMed

    Wang, Yuzhong; Chen, Mingwei; Xie, Yaoming; Wei, Pingrong; Schaefer, Henry F; Schleyer, Paul von R; Robinson, Gregory H

    2015-06-01

    Molecular SiO2 and other simple silicon oxides have remained elusive despite the indispensable use of silicon dioxide materials in advanced electronic devices. Owing to the great reactivity of silicon-oxygen double bonds, as well as the low oxidation state of silicon atoms, the chemistry of simple silicon oxides is essentially unknown. We now report that the soluble disilicon compound, L:Si=Si:L (where L: = :C{N(2,6-(i)Pr2C6H3)CH}2), can be directly oxidized by N2O and O2 to give the carbene-stabilized Si2O3 and Si2O4 moieties, respectively. The nature of the silicon oxide units in these compounds is probed by spectroscopic methods, complementary computations and single-crystal X-ray diffraction.

  15. Structure and resistivity of bismuth nanobelts in situ synthesized on silicon wafer through an ethanol-thermal method

    SciTech Connect

    Gao Zheng; Qin Haiming; Yan Tao

    2011-12-15

    Bismuth nanobelts in situ grown on a silicon wafer were synthesized through an ethanol-thermal method without any capping agent. The structure of the bismuth belt-silicon composite nanostructure was characterized by scanning electron microscope, energy-dispersive X-ray spectroscopy, and high resolution transmission electron microscope. The nanobelt is a multilayered structure 100-800 nm in width and over 50 {mu}m in length. One layer has a thickness of about 50 nm. A unique sword-like nanostructure is observed as the initial structure of the nanobelts. From these observations, a possible growth mechanism of the nanobelt is proposed. Current-voltage property measurements indicate that the resistivity of the nanobelts is slightly larger than that of the bulk bismuth material. - Graphical Abstract: TEM images, EDS, and electron diffraction pattern of bismuth nanobelts. Highlights: Black-Right-Pointing-Pointer Bismuth nanobelts in situ grown on silicon wafer were achieved. Black-Right-Pointing-Pointer Special bismuth-silicon nanostructure. Black-Right-Pointing-Pointer Potential application in sensitive magnetic sensor and other electronic devices.

  16. Silicon oxidation in fluoride solutions

    NASA Technical Reports Server (NTRS)

    Sancier, K. M.; Kapur, V.

    1980-01-01

    Silicon is produced in a NaF, Na2SiF6, and Na matrix when SiF4 is reduced by metallic sodium. Hydrogen is evolved during acid leaching to separate the silicon from the accompanying reaction products, NaF and Na2SiF6. The hydrogen evolution reaction was studied under conditions simulating leaching conditions by making suspensions of the dry silicon powder in aqueous fluoride solutions. The mechanism for the hydrogen evolution is discussed in terms of spontaneous oxidation of silicon resulting from the cooperative effects of (1) elemental sodium in the silicon that reacts with water to remove a protective silica layer, leaving clean reactive silicon, and (2) fluoride in solution that complexes with the oxidized silicon in solution and retards formation of a protective hydrous oxide gel.

  17. Tributylphosphate Extraction Behavior of Bismuthate-Oxidized Americium

    SciTech Connect

    Mincher; Leigh R. Martin; Nicholas C. Schmitt

    2008-08-01

    Higher oxidation states of americium have long been known; however, options for their preparation in acidic solution are limited. The conventional choice, silver-catalyzed peroxydisulfate, is not useful at nitric acid concentrations above about 0.3 M. We investigated the use of sodium bismuthate as an oxidant for Am3+ in acidic solution. Room-temperature oxidation produced AmO2 2+ quantitatively, whereas oxidation at 80 °C produced AmO2+ quantitatively. The efficacy of the method for the production of oxidized americium was verified by fluoride precipitation and by spectroscopic absorbance measurements. We performed absorbance measurements using a conventional 1 cm cell for high americium concentrations and a 100 cm liquid waveguide capillary cell for low americium concentrations. Extinction coefficients for the absorbance of Am3+ at 503 nm, AmO2+ at 514 nm, and AmO2 2+ at 666 nm in 0.1 M nitric acid are reported. We also performed solvent extraction experiments with the hexavalent americium using the common actinide extraction ligand tributyl phosphate (TBP) for comparison to the other hexavalent actinides. Contact with 30% tributyl phosphate in dodecane reduced americium; it was nevertheless extracted using short contact times. The TBP extraction of AmO2 2+ over a range of nitric acid concentrations is shown for the first time and was found to be analogous to that of uranyl, neptunyl, and plutonyl ions.

  18. Bismuth(III) and copper(II) oxides as catalysts for the electro-oxidation of organic compounds

    SciTech Connect

    Franklin, T.C.; Lee, K.H.; Manlangit, E.; Nnodimele, R.

    1996-11-01

    It was shown that copper(II) oxide bound to the anode with polystyrene containing a cationic surfactant acted as a catalyst for the oxidation of organic compounds in aqueous systems in a manner similar to powdered copper oxide suspended in aqueous systems containing the organic compounds and the cationic surfactant. Voltammetric measurements made with these electrodes were reproducible over an extended period of time, and it was possible to reproducibly use the polystyrene bound copper oxide as a catalyst for anodic destruction of several organic compounds. On the other hand, while bismuth(III) oxide bound to platinum with polystyrene was a catalyst for the oxidation of organic compounds in cationic surfactant suspensions, the results were not reproducible. The rate of renewal of the reactant adsorbed on the anode after oxidation was extremely slow. In addition, the Bi{sub 2}O{sub 3} gradually changed during the catalytic reaction to BiO(OH). Both of the bismuth compounds acted as catalysts for the oxidation reaction, but the potential for oxidation of Bi{sub 2}O{sub 3} was less anodic than the potential for BiO(OH). Previous coulometric experiments have indicated clearly that the catalytic intermediate for the copper oxidations is copper(III); however, the coulometric oxidations of bismuth indicate that the intermediate has a bismuth oxidation state slightly over 4. Most probably the intermediate is bismuth (V) and some of the bismuth had agglomerated so that not all of it has been oxidized.

  19. Formation of gas-phase. pi. -allyl radicals from propylene over bismuth oxide and. gamma. -bismuth molybdate catalysts

    SciTech Connect

    Martir, W.; Lunsford, J.H.

    1981-07-01

    Gas-phase ..pi..-allyl radicals were produced when propylene reacted over Bi/sub 2/O/sub 3/ and ..gamma..-bismuth molybdate catalysts at 723 K. The pressure in the catalyst zone was varied between 5 x 10/sup -3/ and 1 torr. The radicals were detected by EPR spectroscopy together with a matrix isolation technique in which argon was used as the diluent. The matrix was formed on a sapphire rod at 12 K which was located 33-cm downstream from the catalyst. Bismuth oxide was more effective in the production of gas-phase allyl radicals than ..gamma..-bismuth molybdate. By contrast ..cap alpha..-bismuth molybdate was ineffective in forming allyl radicals and MoO/sub 3/ acted as a sink for radicals which were produced elsewhere in the system. Comparison of the ..pi..-allyl radical and the stable product concentrations over Bi/sub 2/O/sub 3/ revealed that gas-phase radical recombination reactions served as a major pathway for the formation of 1,5-hexadiene. Addition of small amounts of gas-phase oxygen increased the concentration of allyl radicals, and at greater oxygen levels allyl peroxy radicals were detected. Because of the effect of temperature on the equilibrium between allyl and allyl peroxy radicals, the latter product must be formed in the cooler part of the system.

  20. Bismuth oxide aqueous colloidal nanoparticles inhibit Candida albicans growth and biofilm formation

    PubMed Central

    Hernandez-Delgadillo, Rene; Velasco-Arias, Donaji; Martinez-Sanmiguel, Juan Jose; Diaz, David; Zumeta-Dube, Inti; Arevalo-Niño, Katiushka; Cabral-Romero, Claudio

    2013-01-01

    Multiresistance among microorganisms to common antimicrobials has become one of the most significant concerns in modern medicine. Nanomaterials are a new alternative to successfully treat the multiresistant microorganisms. Nanostructured materials are used in many fields, including biological sciences and medicine. Recently, it was demonstrated that the bactericidal activity of zero-valent bismuth colloidal nanoparticles inhibited the growth of Streptococcus mutans; however the antimycotic potential of bismuth nanostructured derivatives has not yet been studied. The main objective of this investigation was to analyze the fungicidal activity of bismuth oxide nanoparticles against Candida albicans, and their antibiofilm capabilities. Our results showed that aqueous colloidal bismuth oxide nanoparticles displayed antimicrobial activity against C. albicans growth (reducing colony size by 85%) and a complete inhibition of biofilm formation. These results are better than those obtained with chlorhexidine, nystatin, and terbinafine, the most effective oral antiseptic and commercial antifungal agents. In this work, we also compared the antimycotic activities of bulk bismuth oxide and bismuth nitrate, the precursor metallic salt. These results suggest that bismuth oxide colloidal nanoparticles could be a very interesting candidate as a fungicidal agent to be incorporated into an oral antiseptic. Additionally, we determined the minimum inhibitory concentration for the synthesized aqueous colloidal Bi2O3 nanoparticles. PMID:23637533

  1. A model bismuth oxide intergranular thin film in a ZnO twist grain boundary.

    PubMed

    Domingos, H S

    2010-04-14

    The electronic properties of a model bismuth oxide intergranular film in ZnO were investigated using density functional plane wave calculations. It was found that oxygen excess plays a fundamental role in the appearance of electrical activity. The introduction by oxygen interstitials or zinc vacancies results in depletion of the charge in deep gap states introduced by the bismuth impurities. This makes the boundary less metallic and promotes the formation of acceptor states localized to the boundary core, resulting in Schottky barrier enhancement. The results indicate that the origin of electrical activity in thin intergranular bismuth oxide films is probably not distinct from that in decorated ZnO boundaries. PMID:21389532

  2. Efficient water-splitting device based on a bismuth vanadate photoanode and thin-film silicon solar cells.

    PubMed

    Han, Lihao; Abdi, Fatwa F; van de Krol, Roel; Liu, Rui; Huang, Zhuangqun; Lewerenz, Hans-Joachim; Dam, Bernard; Zeman, Miro; Smets, Arno H M

    2014-10-01

    A hybrid photovoltaic/photoelectrochemical (PV/PEC) water-splitting device with a benchmark solar-to-hydrogen conversion efficiency of 5.2% under simulated air mass (AM) 1.5 illumination is reported. This cell consists of a gradient-doped tungsten-bismuth vanadate (W:BiVO4 ) photoanode and a thin-film silicon solar cell. The improvement with respect to an earlier cell that also used gradient-doped W:BiVO4 has been achieved by simultaneously introducing a textured substrate to enhance light trapping in the BiVO4 photoanode and further optimization of the W gradient doping profile in the photoanode. Various PV cells have been studied in combination with this BiVO4 photoanode, such as an amorphous silicon (a-Si:H) single junction, an a-Si:H/a-Si:H double junction, and an a-Si:H/nanocrystalline silicon (nc-Si:H) micromorph junction. The highest conversion efficiency, which is also the record efficiency for metal oxide based water-splitting devices, is reached for a tandem system consisting of the optimized W:BiVO4 photoanode and the micromorph (a-Si:H/nc-Si:H) cell. This record efficiency is attributed to the increased performance of the BiVO4 photoanode, which is the limiting factor in this hybrid PEC/PV device, as well as better spectral matching between BiVO4 and the nc-Si:H cell.

  3. Stable high conductivity ceria/bismuth oxide bilayered electrolytes

    SciTech Connect

    Wachsman, E.D.; Jayaweera, P.; Jiang, N.; Lowe, D.M.; Pound, B.G.

    1997-01-01

    The authors have developed a high conductivity bilayered ceria/bismuth oxide anolyte/electrolyte that uses the Po{sub 2} gradient to obtain stability at the anolyte-electrolyte interface and reduced electronic conduction due to the electrolyte region. Results in terms of solid oxide fuel cell (SOFC) performance and stability are presented. These results include a 90 to 160 mV increase in open-circuit potential, depending on temperature, with the bilayered structure as compared to SOFCs fabricated from a single ceria layer. An open-circuit potential of >1.0 V was obtained at 500 C with the bilayered structure. This increase in open-circuit potential is obtained without any measurable increase in cell resistance and is stable for over 1,400 h of testing, under both open-circuit and maximum power conditions. Moreover, SOFCs fabricated from the bilayered structure result in a 33% greater power density as compared to cells with a single ceria electrolyte layer.

  4. Morphology modulated growth of bismuth tungsten oxide nanocrystals

    SciTech Connect

    Yao Shushan; Wei, Jiyong; Huang Baibiao Feng Shengyu; Zhang Xiaoyang; Qin Xiaoyan; Wang Peng; Wang Zeyan; Zhang Qi; Jing Xiangyang; Zhan Jie

    2009-02-15

    Two kinds of bismuth tungsten oxide nanocrystals were prepared by microwave hydrothermal method. The morphology modulation of nanocrystals synthesized with precursor suspension's pH varied from 0.25 (strong acid) to 10.05 (base) was studied. The 3D flower like aggregation of Bi{sub 2}WO{sub 6} nanoflakes was synthesized in acid precursor suspension and the nanooctahedron crystals of Bi{sub 3.84}W{sub 0.16}O{sub 6.24} were synthesized in alkalescent precursor. The dominant crystal is changed from Bi{sub 2}WO{sub 6} to Bi{sub 3.84}W{sub 0.16}O{sub 6.24} when the precursor suspension changes from acid to alkalescence. The growth mechanisms of Bi{sub 2}WO{sub 6} and Bi{sub 3.84}W{sub 0.16}O{sub 6.24} were attributed to the different solubility of WO{sub 4}{sup 2-} and [Bi{sub 2}O{sub 2}]{sup 2+} in precursor suspensions with various pH. For the decomposition of Rhodamine B (RhB) under visible light irradiation ({lambda}>400 nm), different morphology of Bi{sub 2}WO{sub 6} crystal samples obtained by microwavesolvothermal process showed different photocatalytic activity. - Graphical abstract: The morphology modulation of bismuth tungsten oxide nanocrystals synthesized by microwave hydrothermal method with precursor suspension's pH varied from 0.25 (strong acid) to 10.05 (base) was studied. The 3D flower like aggregation of Bi{sub 2}WO{sub 6} nanoflakes and nanooctahedron crystals of Bi{sub 3.84}W{sub 0.16}O{sub 6.24} were prepared. The growth mechanisms of Bi{sub 2}WO{sub 6} and Bi{sub 3.84}W{sub 0.16}O{sub 6.24} were attributed to the different precipitation ability and solubility of H{sub 2}WO{sub 4} and Bi(OH){sub 3} in precursor suspensions with various pH. The photocatalytic evaluation, via the decomposition of Rhodamine B (RhB) under visible light irradiation ({lambda}>420 nm), reveals that nanocrystalline Bi{sub 2}WO{sub 6} samples obtained in different condition exhibit different photocatalytic activities which depend on pH value of the precursor suspensions.

  5. Oxidation mechanism of formic acid on the bismuth adatom-modified Pt(111) surface.

    PubMed

    Perales-Rondón, Juan Victor; Ferre-Vilaplana, Adolfo; Feliu, Juan M; Herrero, Enrique

    2014-09-24

    In order to improve catalytic processes, elucidation of reaction mechanisms is essential. Here, supported by a combination of experimental and computational results, the oxidation mechanism of formic acid on Pt(111) electrodes modified by the incorporation of bismuth adatoms is revealed. In the proposed model, formic acid is first physisorbed on bismuth and then deprotonated and chemisorbed in formate form, also on bismuth, from which configuration the C-H bond is cleaved, on a neighbor Pt site, yielding CO2. It was found computationally that the activation energy for the C-H bond cleavage step is negligible, which was also verified experimentally. PMID:25188779

  6. Structure and resistivity of bismuth nanobelts in situ synthesized on silicon wafer through an ethanol-thermal method

    NASA Astrophysics Data System (ADS)

    Gao, Zheng; Qin, Haiming; Yan, Tao; Liu, Hong; Wang, Jiyang

    2011-12-01

    Bismuth nanobelts in situ grown on a silicon wafer were synthesized through an ethanol-thermal method without any capping agent. The structure of the bismuth belt-silicon composite nanostructure was characterized by scanning electron microscope, energy-dispersive X-ray spectroscopy, and high resolution transmission electron microscope. The nanobelt is a multilayered structure 100-800 nm in width and over 50 μm in length. One layer has a thickness of about 50 nm. A unique sword-like nanostructure is observed as the initial structure of the nanobelts. From these observations, a possible growth mechanism of the nanobelt is proposed. Current-voltage property measurements indicate that the resistivity of the nanobelts is slightly larger than that of the bulk bismuth material.

  7. Investigation of solution-processed bismuth-niobium-oxide films

    SciTech Connect

    Inoue, Satoshi; Ariga, Tomoki; Matsumoto, Shin; Onoue, Masatoshi; Miyasako, Takaaki; Tokumitsu, Eisuke; Shimoda, Tatsuya; Chinone, Norimichi; Cho, Yasuo

    2014-10-21

    The characteristics of bismuth-niobium-oxide (BNO) films prepared using a solution process were investigated. The BNO film annealed at 550°C involving three phases: an amorphous phase, Bi₃NbO₇ fluorite microcrystals, and Nb-rich cubic pyrochlore microcrystals. The cubic pyrochlore structure, which was the main phase in this film, has not previously been reported in BNO films. The relative dielectric constant of the BNO film was approximately 140, which is much higher than that of a corresponding film prepared using a conventional vacuum sputtering process. Notably, the cubic pyrochlore microcrystals disappeared with increasing annealing temperature and were replaced with triclinic β-BiNbO₄ crystals at 590°C. The relative dielectric constant also decreased with increasing annealing temperature. Therefore, the high relative dielectric constant of the BNO film annealed at 550°C is thought to result from the BNO cubic pyrochlore structure. In addition, the BNO films annealed at 500°C contained approximately 6.5 atm.% carbon, which was lost at approximately 550°C. This result suggests that the carbon in the BNO film played an important role in the formation of the cubic pyrochlore structure.

  8. Bismuth Oxide: A New Lithium-Ion Battery Anode

    PubMed Central

    Li, Yuling; Trujillo, Matthias A.; Fu, Engang; Patterson, Brian; Fei, Ling; Xu, Yun; Deng, Shuguang; Smirnov, Sergei; Luo, Hongmei

    2013-01-01

    Bismuth oxide directly grown on nickel foam (p-Bi2O3/Ni) was prepared by a facile polymer-assisted solution approach and was used directly as a lithium-ion battery anode for the first time. The Bi2O3 particles were covered with thin carbon layers, forming network-like sheets on the surface of the Ni foam. The binder-free p-Bi2O3/Ni shows superior electrochemical properties with a capacity of 668 mAh/g at a current density of 800 mA/g, which is much higher than that of commercial Bi2O3 powder (c-Bi2O3) and Bi2O3 powder prepared by the polymer-assisted solution method (p-Bi2O3). The good performance of p-Bi2O3/Ni can be attributed to higher volumetric utilization efficiency, better connection of active materials to the current collector, and shorter lithium ion diffusion path. PMID:24416506

  9. Structure, defects, and strain in silicon-silicon oxide interfaces

    SciTech Connect

    Kovačević, Goran Pivac, Branko

    2014-01-28

    The structure of the interfaces between silicon and silicon-oxide is responsible for proper functioning of MOSFET devices while defects in the interface can deteriorate this function and lead to their failure. In this paper we modeled this interface and characterized its defects and strain. MD simulations were used for reconstructing interfaces into a thermodynamically stable configuration. In all modeled interfaces, defects were found in the form of three-coordinated silicon atom, five coordinated silicon atom, threefold-coordinated oxygen atom, or displaced oxygen atom. Three-coordinated oxygen atom can be created if dangling bonds on silicon are close enough. The structure and stability of three-coordinated silicon atoms (P{sub b} defect) depend on the charge as well as on the electric field across the interface. The negatively charged P{sub b} defect is the most stable one, but the electric field resulting from the interface reduces that stability. Interfaces with large differences in periodic constants of silicon and silicon oxide can be stabilized by buckling of silicon layer. The mechanical stress resulted from the interface between silicon and silicon oxide is greater in the silicon oxide layer. Ab initio modeling of clusters representing silicon and silicon oxide shows about three time larger susceptibility to strain in silicon oxide than in silicon if exposed to the same deformation.

  10. Hydrosilane and bismuth-accelerated palladium catalyzed aerobic oxidative esterification of benzylic alcohols with air.

    PubMed

    Bai, Xing-Feng; Ye, Fei; Zheng, Long-Sheng; Lai, Guo-Qiao; Xia, Chun-Gu; Xu, Li-Wen

    2012-09-01

    In a palladium-catalyzed oxidative esterification, hydrosilane can serve as an activator of palladium catalyst with bismuth, thus leading to a novel ligand- and silver-free palladium catalyst system for facile oxidative esterification of a variety of benzylic alcohols in good yields.

  11. Hydrosilane and bismuth-accelerated palladium catalyzed aerobic oxidative esterification of benzylic alcohols with air.

    PubMed

    Bai, Xing-Feng; Ye, Fei; Zheng, Long-Sheng; Lai, Guo-Qiao; Xia, Chun-Gu; Xu, Li-Wen

    2012-09-01

    In a palladium-catalyzed oxidative esterification, hydrosilane can serve as an activator of palladium catalyst with bismuth, thus leading to a novel ligand- and silver-free palladium catalyst system for facile oxidative esterification of a variety of benzylic alcohols in good yields. PMID:22814568

  12. Relative stability of multiple bonds between silicon and bismuth. A theoretical study

    NASA Astrophysics Data System (ADS)

    Ma, Jia-Ying; Su, Ming-Der

    2011-08-01

    Substituent effects on the potential energy surface of XSiBi (X = H, Li, Na, BeH, MgH, BH2, AlH2, CH3, SiH3, NH2, PH2, OH, SH, F, and Cl) were investigated by using B3LYP/Def2-TZVP, B3PW91/Def2-TZVPP, and CCSD(T) methods. The isomers include structures with formal double (Sidbnd BiX) and triple (XSitbnd Bi) bonds to silicon-bismuth, so a direct comparison of these types of species is possible. Our model calculations indicate that electropositively substituted Sidbnd BiX species are thermodynamically and kinetically more stable than their isomeric XSitbnd Bi molecules. Moreover, the theoretical findings suggest that F, OH, NH2, and CH3 substitution prefer to shift the double bond (Sidbnd BiX) by forming a triple bond (XSitbnd Bi).

  13. Dextran coated bismuth-iron oxide nanohybrid contrast agents for computed tomography and magnetic resonance imaging

    PubMed Central

    Naha, Pratap C.; Zaki, Ajlan Al; Hecht, Elizabeth; Chorny, Michael; Chhour, Peter; Blankemeyer, Eric; Yates, Douglas M.; Witschey, Walter R. T.; Litt, Harold I.; Tsourkas, Andrew; Cormode, David P.

    2014-01-01

    Bismuth nanoparticles have been proposed as a novel CT contrast agent, however few syntheses of biocompatible bismuth nanoparticles have been achieved. We herein report the synthesis of composite bismuth-iron oxide nanoparticles (BION) that are based on a clinically approved, dextran-coated iron oxide formulation; the particles have the advantage of acting as contrast agents for both CT and MRI. BION were synthesized and characterized using various analytical methods. BION CT phantom images revealed that the X-ray attenuation of the different formulations was dependent upon the amount of bismuth present in the nanoparticle, while T2-weighted MRI contrast decreased with increasing bismuth content. No cytotoxicity was observed in Hep G2 and BJ5ta cells after 24 hours incubation with BION. The above properties, as well as the yield of synthesis and bismuth inclusion efficiency, led us to select the Bi-30 formulation for in vivo experiments, performed in mice using a micro-CT and a 9.4 T MRI system. X-ray contrast was observed in the heart and blood vessels over a 2 hour period, indicating that Bi-30 has a prolonged circulation half-life. Considerable signal loss in T2-weighted MR images was observed in the liver compared to pre-injection scans. Evaluation of the biodistribution of Bi-30 revealed that bismuth is excreted via the urine, with significant concentrations found in the kidneys and urine. In vitro experiments confirmed the degradability of Bi-30. In summary, dextran coated BION are biocompatible, biodegradable, possess strong X-ray attenuation properties and also can be used as T2-weighted MR contrast agents. PMID:25485115

  14. Dextran coated bismuth-iron oxide nanohybrid contrast agents for computed tomography and magnetic resonance imaging.

    PubMed

    Naha, Pratap C; Zaki, Ajlan Al; Hecht, Elizabeth; Chorny, Michael; Chhour, Peter; Blankemeyer, Eric; Yates, Douglas M; Witschey, Walter R T; Litt, Harold I; Tsourkas, Andrew; Cormode, David P

    2014-12-14

    Bismuth nanoparticles have been proposed as a novel CT contrast agent, however few syntheses of biocompatible bismuth nanoparticles have been achieved. We herein report the synthesis of composite bismuth-iron oxide nanoparticles (BION) that are based on a clinically approved, dextran-coated iron oxide formulation; the particles have the advantage of acting as contrast agents for both CT and MRI. BION were synthesized and characterized using various analytical methods. BION CT phantom images revealed that the X-ray attenuation of the different formulations was dependent upon the amount of bismuth present in the nanoparticle, while T2-weighted MRI contrast decreased with increasing bismuth content. No cytotoxicity was observed in Hep G2 and BJ5ta cells after 24 hours incubation with BION. The above properties, as well as the yield of synthesis and bismuth inclusion efficiency, led us to select the Bi-30 formulation for in vivo experiments, performed in mice using a micro-CT and a 9.4 T MRI system. X-ray contrast was observed in the heart and blood vessels over a 2 hour period, indicating that Bi-30 has a prolonged circulation half-life. Considerable signal loss in T2-weighted MR images was observed in the liver compared to pre-injection scans. Evaluation of the biodistribution of Bi-30 revealed that bismuth is excreted via the urine, with significant concentrations found in the kidneys and urine. In vitro experiments confirmed the degradability of Bi-30. In summary, dextran coated BION are biocompatible, biodegradable, possess strong X-ray attenuation properties and also can be used as T2-weighted MR contrast agents.

  15. Kinetics and characterization of bismuth molybdate catalysts. 1. A gradientless partial oxidation reactor

    SciTech Connect

    Burban, P.M.; Schuit, G.C.A.; Bicschoff, K.B. ); Koch, T.A. Du Pont Experimental Station, Wilmington, DE )

    1990-12-01

    A gradientless laboratory fixed bed reactor was designed for studying the partial oxidation of 1-butene to 1,3-butadiene over bismuth-molybdate catalysts. By dilution of the catalyst bed with inert silicon carbide, axial catalyst bed temperature gradients were routinely reduced to 2 K or less over the temperature range 650-740 K for the exothermic model reaction. A systematic experimental procedure was developed and used to show that potential transport 'disguises' did not significantly influence the intrinsic rate of butadiene formation measured under both integral and differential conditions. For one Bi{sub 2}MoO{sub 6} catalyst system, rate of butadiene formation data over the temperature range 700-740 K were fit to pseudo first-order (in butene) kinetics. Analytical solutions of the governing equations describing fixed bed reactor transport disguises for first-order catalytic reactions were used to confirm that the reactor operated in a near gradientless fashion, in agreement with experiment.

  16. Catalytic oxidation of propylene--7. Use of temperature programmed reoxidation to characterize. gamma. -bismuth molybdate

    SciTech Connect

    Uda, T.; Lin, T.T.; Keulks, G.W.

    1980-03-01

    Temperature-programed reoxidation of propylene-reduced ..gamma..-Bi/sub 2/MoO/sub 6/ revealed a low-temperature peak (LTP) at 158/sup 0/C and a high-temperature peak (HTP) at 340/sup 0/C. Auger spectroscopy and X-ray diffraction of reduced and partially or completely reoxidized bismuth molybdate showed that at the LTP, molybdenum(IV) is oxidized to molybdenum(VI) and bismuth, from the metallic state to an oxidation state between zero and three, and that the HTP is associated with the complete oxidation of bismuth to bismuth(III). Activity tests for propylene oxidation showed lower acrolein formation on the catalyst, on which only the LTP was reoxidized than on catalysts on which both peaks were reoxidized. The reoxidation kinetics of the catalyst under conditions corresponding to the LTP showed an activation energy of 22.9 kcal/mole below 170/sup 0/C and near zero above 170/sup 0/C; the break in the Arrhenius plot of reoxidation of the catalyst under conditions corresponding to the HTP was at 400/sup 0/C, with activation energies of 46 kcal/mole at lower and near zero at higher temperatures. Propylene oxidation was apparently rate-limited by the HTP reoxidation process below 400/sup 0/C and by allylic hydrogen abstraction above 400/sup 0/C.

  17. Structure-Composition-Property Relationships of Complex Bismuth Oxide Based Photocatalysts

    SciTech Connect

    Vogt, Thomas

    2014-01-08

    Development of a new family of up- and down-conversion materials based on oxtfluorides that can potentially increase photocatalytic activities of photocatalysts such as bismuth oxides and can also be used as phosphors in Al1-xGaxN-based devices and solar devices.

  18. Promotional Effects of Bismuth on the Formation of Platinum-Bismuth Nanowires Network and the Electrocatalytic Activity toward Ethanol Oxidation

    SciTech Connect

    Du, W.; Su, D.; Wang, Q.; Frenkel, A.I.; Teng, X.

    2011-01-11

    Electrocatalytic activities of Pt and their alloys toward small organic molecules oxidation are highly dependent on their morphology, chemical composition, and electronic structure. Here, we report the synthesis of dendrite-like Pt{sub 95}Bi{sub 5}, Pt{sub 83}Bi{sub 17}, and Pt{sub 76}Bi{sub 24} nanowires network with a high aspect ratio (up to 68). The electronic structure and heterogeneous crystalline structure have been studied using combined techniques, including aberration-corrected scanning transmission electron microscopy (STEM) and X-ray absorption near-edge structure (XANES) spectroscopy. Bismuth-oriented attachment growth mechanism has been proposed for the anisotropic growth of Pt/Bi. The electrochemical activities of Pt/Bi nanowires network toward ethanol oxidations have been tested. In particular, the as-made Pt{sub 95}Bi{sub 5} appears to have superior activity toward ethanol oxidation in comparison with the commercial Pt/C catalyst. The reported promotional effect of Bi on the formation of Pt/Bi and electrochemical activities will be important to design effective catalysts for ethanol fuel cell application.

  19. Promotional Effects of Bismuth on the Formation of Platinum-Bismuth Nanowires Network and the Electrocatalytic Activity toward Ethanol Oxidation

    SciTech Connect

    X Teng; W Du; D Su; Q Wang; A Frenkel

    2011-12-31

    Electrocatalytic activities of Pt and their alloys toward small organic molecules oxidation are highly dependent on their morphology, chemical composition, and electronic structure. Here, we report the synthesis of dendrite-like Pt{sub 95}Bi{sub 5}, Pt{sub 83}Bi{sub 17}, and Pt{sub 76}Bi{sub 24} nanowires network with a high aspect ratio (up to 68). The electronic structure and heterogeneous crystalline structure have been studied using combined techniques, including aberration-corrected scanning transmission electron microscopy (STEM) and X-ray absorption near-edge structure (XANES) spectroscopy. Bismuth-oriented attachment growth mechanism has been proposed for the anisotropic growth of Pt/Bi. The electrochemical activities of Pt/Bi nanowires network toward ethanol oxidations have been tested. In particular, the as-made Pt{sub 95}Bi{sub 5} appears to have superior activity toward ethanol oxidation in comparison with the commercial Pt/C catalyst. The reported promotional effect of Bi on the formation of Pt/Bi and electrochemical activities will be important to design effective catalysts for ethanol fuel cell application.

  20. Efficient solar water splitting by enhanced charge separation in a bismuth vanadate-silicon tandem photoelectrode.

    PubMed

    Abdi, Fatwa F; Han, Lihao; Smets, Arno H M; Zeman, Miro; Dam, Bernard; van de Krol, Roel

    2013-01-01

    Metal oxides are generally very stable in aqueous solutions and cheap, but their photochemical activity is usually limited by poor charge carrier separation. Here we show that this problem can be solved by introducing a gradient dopant concentration in the metal oxide film, thereby creating a distributed n(+)-n homojunction. This concept is demonstrated with a low-cost, spray-deposited and non-porous tungsten-doped bismuth vanadate photoanode in which carrier-separation efficiencies of up to 80% are achieved. By combining this state-of-the-art photoanode with an earth-abundant cobalt phosphate water-oxidation catalyst and a double- or single-junction amorphous Si solar cell in a tandem configuration, stable short-circuit water-splitting photocurrents of ~4 and 3 mA cm(-2), respectively, are achieved under 1 sun illumination. The 4 mA cm(-2) photocurrent corresponds to a solar-to-hydrogen efficiency of 4.9%, which is the highest efficiency yet reported for a stand-alone water-splitting device based on a metal oxide photoanode. PMID:23893238

  1. Controlled oxidative synthesis of Bi nanoparticles and emission centers in bismuth glass nanocomposites for photonic application

    NASA Astrophysics Data System (ADS)

    Singh, Shiv Prakash; Karmakar, Basudeb

    2011-09-01

    Here we demonstrate an oxidative process to control metallic bismuth (Bi 0) nanoparticles (NPs) creation in bismuth glass nanocomposites by using K 2S 2O 8 as oxidant and enhanced transparency of bismuth glasses. Formation of Bi 0 NPs has been monitored by their distinct surface plasmon resonance (SPR) band at 460 nm in the UV-visible absorption spectra. It is further confirmed by the transmission electron microscopy (TEM) images which disclose the formation of spherical Bi 0 NPs whereas the selected area electron diffraction (SAED) pattern reveals their crystalline rhombohedral phase. These glasses are found to exhibit visible and near infrared (NIR) luminescence bands at 630 and 843 nm respectively on excitation at 460 nm of the SPR band. It is realized that the luminescence center of bismuth species is an uncertain issue, however, it is reasonable to consider that the emission band at 630 nm is due to the combination of 2D 5/2 → 4S 3/2 of Bi 0 and 2P 3/2 (1) → 2P 1/2 of Bi 2+ transitions, and that of NIR emission band at 843 nm is attributed to the 2D 3/2 → 4S 3/2 of Bi 0 transition.

  2. Separation of Americium in High Oxidation States from Curium Utilizing Sodium Bismuthate.

    PubMed

    Richards, Jason M; Sudowe, Ralf

    2016-05-01

    A simple separation of americium from curium would support closure of the nuclear fuel cycle, assist in nuclear forensic analysis, and allow for more accurate measurement of neutron capture properties of (241)Am. Methods for the separation of americium from curium are however complicated and time-consuming due to the similar chemical properties of these elements. In this work a novel method for the separation of americium from curium in nitric acid media was developed using sodium bismuthate to perform both the oxidation and separation. Sodium bismuthate is shown to be a promising material for performing a simple and rapid separation. Curium is more strongly retained than americium on the undissolved sodium bismuthate at nitric acid concentrations below 1.0 M. A separation factor of ∼90 was obtained in 0.1 M nitric acid. This separation factor is achieved within the first minute of contact and is maintained for at least 2 h of contact. Separations using sodium bismuthate were performed using solid-liquid extraction as well as column chromatography. PMID:27079565

  3. Fast oxygen diffusion in bismuth oxide probed by quasielastic neutron scattering

    DOE PAGES

    Mamontov, Eugene

    2016-09-24

    In this paper, we present the first, to our knowledge, study of solid state oxygen translational diffusion by quasielastic neutron scattering. Such studies in the past might have been precluded by relatively low diffusivities of oxygen anions in the temperature range amenable to neutron scattering experiments. To explore the potential of the quasielastic scattering technique, which can deduce atomic diffusion jump length of oxygen anions through the momentum transfer dependence of the scattering signal, we have selected the fastest known oxygen conductor, bismuth oxide. Finally, we have found the oxygen anion jump length in excellent agreement with the nearest oxygen-vacancymore » distance in the anion sublattice of the fluorite-related structure of bismuth oxide.« less

  4. Synthesis of α-Bismuth oxide using solution combustion method and its photocatalytic properties

    NASA Astrophysics Data System (ADS)

    Astuti, Y.; Fauziyah, A.; Nurhayati, S.; Wulansari, A. D.; Andianingrum, R.; Hakim, A. R.; Bhaduri, G.

    2016-02-01

    The monoclinic bismuth oxide was prepared by the solution combustion method using bismuthyl nitrate as the raw material and citric acid as fuel. The synthesis process consisted of the formation of a clear transparent solution and the formation of white powder after heating the mixture at 250 °C for 2 hours. The yellow pale crystalline materials were obtained after calcination of the white powder at 600 °C for 80 minutes. Furthermore, the photocatalytic activity of the product was also studied using methyl orange as a model pollutant. The result showed that the coral reef-like bismuth oxide was able to degrade 50 mL methyl orange (5 ppm) by 37.8% within 12 hours irradiation using 75-watt tungsten lamp.

  5. Method of forming buried oxide layers in silicon

    DOEpatents

    Sadana, Devendra Kumar; Holland, Orin Wayne

    2000-01-01

    A process for forming Silicon-On-Insulator is described incorporating the steps of ion implantation of oxygen into a silicon substrate at elevated temperature, ion implanting oxygen at a temperature below 200.degree. C. at a lower dose to form an amorphous silicon layer, and annealing steps to form a mixture of defective single crystal silicon and polycrystalline silicon or polycrystalline silicon alone and then silicon oxide from the amorphous silicon layer to form a continuous silicon oxide layer below the surface of the silicon substrate to provide an isolated superficial layer of silicon. The invention overcomes the problem of buried isolated islands of silicon oxide forming a discontinuous buried oxide layer.

  6. Influence of the ionization-energy losses of high-energy bismuth ions on the development of helium blisters in silicon

    SciTech Connect

    Reutov, V. F. Dmitriev, S. N.; Sohatsky, A. S.; Zaluzhnyi, A. G.

    2015-10-15

    Understanding the behavior of helium in solids under conditions of intense ionizing radiation is of particular interest in solving many problems of nuclear, fusion, and space materials science and also in microelectronics. The observed effect of suppressing the formation of helium blisters on the surface of helium ion-doped silicon as a result of irradiation with high-energy bismuth ions is reported in this publication. It is suggested that a possible decrease in the concentration of helium atoms in silicon is due to their radiationinduced desorption from the area of doping in terms of the high-impact ionization of bismuth ions.

  7. High performance zirconia-bismuth oxide nanocomposite electrolytes for lower temperature solid oxide fuel cells

    NASA Astrophysics Data System (ADS)

    Joh, Dong Woo; Park, Jeong Hwa; Kim, Do Yeub; Yun, Byung-Hyun; Lee, Kang Taek

    2016-07-01

    We develop a novel nanocomposite electrolyte, consisting of yttria-stabilized zirconia (YSZ) and erbia-stabilized bismuth oxide (ESB). The 20 mol% ESB-incorporated YSZ composite (20ESB-YSZ) achieves the high density (>97%) at the low sintering temperature of 800 °C. The microstructural analysis of 20ESB-YSZ reveals the characteristic nanocomposite structure of the highly percolated ESB phase at the YSZ grain boundaries (a few ∼ nm thick). The ionic conductivity of 20ESB-YSZ is increased by 5 times compared to that of the conventional YSZ due to the fast oxygen ion transport along the ESB phase. Moreover, this high conductivity is maintained up to 580 h, indicating high stability of the ESB-YSZ nanocomposite. In addition, the oxygen reduction reaction at the composite electrolyte/cathode interface is effectively enhanced (∼70%) at the temperature below 650 °C, mainly due to the fast dissociative oxygen adsorption on the ESB surface as well as the rapid oxygen ion incorporation into the ESB lattice. Thus, we believe this ESB-YSZ nanocomposite is a promising electrolyte for high performance solid oxide fuel cells at reduced temperatures.

  8. Bismuth germanate coupled to near ultraviolet silicon photomultipliers for time-of-flight PET

    NASA Astrophysics Data System (ADS)

    Kwon, Sun Il; Gola, Alberto; Ferri, Alessandro; Piemonte, Claudio; Cherry, Simon R.

    2016-09-01

    Bismuth germanate (BGO) was a very attractive scintillator in early-generation positron emission tomography (PET) scanners. However, the major disadvantages of BGO are lower light yield and longer rise and decay time compared to currently popular scintillators such as LSO and LYSO. This results in poorer coincidence timing resolution and it has generally been assumed that BGO is not a suitable scintillator for time-of-flight (TOF) PET applications. However, when a 511 keV photon interacts in a scintillator, a number of Cerenkov photons are produced promptly by energetic electrons released by photoelectric or Compton interactions. If these prompt photons can be captured, they could provide a better timing trigger for PET. Since BGO has a high refractive index (increasing the Cerenkov light yield) and excellent optical transparency down to 320 nm (Cerenkov light yield is higher at shorter wavelengths), we hypothesized that the coincidence timing resolution of BGO can be significantly improved by efficient detection of the Cerenkov photons. However, since the number of Cerenkov photons is far less than the number of scintillation photons, and they are more abundant in the UV and blue part of the spectrum, photosensors need to have high UV/blue sensitivity, fast temporal response, and very low noise in order to trigger on the faint Cerenkov signal. In this respect, NUV-HD silicon photomultipliers (SiPMs) (FBK, Trento, Italy) are an excellent fit for our approach. In this study, coincidence events were measured using BGO crystals coupled with NUV-HD SiPMs. The existence and influence of Cerenkov photons on the timing measurements were studied using different configurations to exploit the directionality of the Cerenkov emissions. Coincidence resolving time values (FWHM) of ~270 ps from 2  ×  3  ×  2 mm3 BGO crystals and ~560 ps from 3  ×  3  ×  20 mm3 BGO crystals were obtained. To our knowledge, these are the best

  9. Concentration dependences of elastooptic coefficients of germanate glasses containing lead and bismuth oxides

    SciTech Connect

    Rabukhin, A.I.

    1995-11-01

    Concentration dependences of elastooptic coefficients of lead - bismuth - germanate glasses with compositions from virtually the entire range of glass formation in the system PbO-Bi{sub 2}O{sub 3}-GeO{sub 2} are investigated. Partial elastooptic coefficients of the oxide ingredients of the investigated glasses are determined. The results are interpreted with consideration of the nature of the elastooptic interaction in glasses subjected to uniaxial stress. The data can be used for designing compositions of optical media for the light and acoustic lines of acoustooptical devices.

  10. Effect of Bismuth Oxide on the Microstructure and Electrical Conductivity of Yttria Stabilized Zirconia

    PubMed Central

    Liu, Liwei; Zhou, Zheng; Tian, He; Li, Jixue

    2016-01-01

    Bismuth oxide (Bi2O3)-doped yttria-stabilized zirconia (YSZ) were prepared via the solid state reaction method. X-ray diffraction and electron diffraction spectroscopy results indicate that doping with 2 mol% Bi2O3 and adding 10 mol% yttria result in a stable zirconia cubic phase. Adding Bi2O3 as a dopant increases the density of zirconia to above 96%, while reducing its normal sintering temperature by approximately 250 °C. Moreover, electrical impedance analyses show that adding Bi2O3 enhances the conductivity of zirconia, improving its capability as a solid electrolyte for intermediate or even lower temperatures. PMID:26985895

  11. Effect of Bismuth Oxide on the Microstructure and Electrical Conductivity of Yttria Stabilized Zirconia.

    PubMed

    Liu, Liwei; Zhou, Zheng; Tian, He; Li, Jixue

    2016-03-14

    Bismuth oxide (Bi2O3)-doped yttria-stabilized zirconia (YSZ) were prepared via the solid state reaction method. X-ray diffraction and electron diffraction spectroscopy results indicate that doping with 2 mol% Bi2O3 and adding 10 mol% yttria result in a stable zirconia cubic phase. Adding Bi2O3 as a dopant increases the density of zirconia to above 96%, while reducing its normal sintering temperature by approximately 250°C. Moreover, electrical impedance analyses show that adding Bi2O3 enhances the conductivity of zirconia, improving its capability as a solid electrolyte for intermediate or even lower temperatures.

  12. Laser induced oxidation and optical properties of bismuth telluride nanoplates

    NASA Astrophysics Data System (ADS)

    Ye, Zhipeng; Sucharitakul, Sukrit; Keiser, Courtney; Kidd, Tim E.; Gao, Xuan P. A.; He, Rui

    2015-03-01

    Bi-Te nanoplates (NPs) grown by low pressure vapor transport method were studied by Raman spectroscopy, atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDS), and Auger electron spectroscopy (AES). We find that the surface of relatively thick (more than tens of nanometers) Bi2Te3 NPs is oxidized in the air and forms a bump under heating with moderate laser power, as revealed by the emergence of Raman lines characteristic of Bi2O3 and TeO2 and characterization by AFM and EDS. Further increase of laser power burns holes on the surface of the NPs. Thin (thicknesses less than 20 nm) NPs with stoichiometry different from Bi2Te3 were also studied. Raman lines from non-stoichiometric NPs are different from those of stoichiometric ones. Thin NPs with the same thickness but different stoichiometries show different color contrast compared to the substrate in the optical image. This indicates that the optical absorption coefficient in thin Bi-Te NPs strongly depends on their stoichiometry. Controlling the stoichiometry in the Bi-Te NP growth is thus very important for their thermoelectric, electronic, and optical device applications. Supported by American Chemical Society Petroleum Research Fund (Grant 53401-UNI10), NSF (No. DMR-1206530, No. DMR-1410496, DMR-1151534), UNI Faculty Summer Fellowship and a UNI capacity building grant.

  13. One-dimensional single-crystalline bismuth oxide micro/nanoribbons: morphology-controlled synthesis and luminescent properties.

    PubMed

    Ling, B; Sun, X W; Zhao, J L; Shen, Y Q; Dong, Z L; Sun, L D; Li, S F; Zhang, S

    2010-12-01

    Based on a facile vapor-phase transport method without any catalyst and template, one-dimensional single-crystalline bismuth oxide (Bi2O3) micro/nanoribbons were fabricated on silicon substrates in large quantities and morphology-controlled fabrication of Bi2O3 was achieved from a single precursor. The widths of Bi2O3 ribbons varied from 0.2 to 20 microm depending on the deposition temperatures. The thickness was in the range of 0.1-2 microm and the length reached several hundred micrometers and even millimeter range. The detailed composition and structural analysis confirmed the single-crystalline nature of alpha-Bi2O3 micro/nanoribbons with monoclinic structure. The photoluminescence spectrum of a single Bi2O3 ribbon showed a broadband emission from 450 to 750 nm in the visible region, consisting two peaks located at 589 and 697 nm which were primarily originated from the impurity ions and crystal defects. A self-catalyzed vapor-solid model was proposed to account for the growth mechanism of Bi2O3 ribbons with different morphologies. PMID:21121334

  14. Bismuth doped lanthanum ferrite perovskites as novel cathodes for intermediate-temperature solid oxide fuel cells.

    PubMed

    Li, Mei; Wang, Yao; Wang, Yunlong; Chen, Fanglin; Xia, Changrong

    2014-07-23

    Bismuth is doped to lanthanum strontium ferrite to produce ferrite-based perovskites with a composition of La(0.8-x)Bi(x)Sr0.2FeO(3-δ) (0 ≤ x ≤ 0.8) as novel cathode material for intermediate-temperature solid oxide fuel cells. The perovskite properties including oxygen nonstoichiometry coefficient (δ), average valence of Fe, sinterability, thermal expansion coefficient, electrical conductivity (σ), oxygen chemical surface exchange coefficient (K(chem)), and chemical diffusion coefficient (D(chem)) are explored as a function of bismuth content. While σ decreases with x due to the reduced Fe(4+) content, D(chem) and K(chem) increase since the oxygen vacancy concentration is increased by Bi doping. Consequently, the electrochemical performance is substantially improved and the interfacial polarization resistance is reduced from 1.0 to 0.10 Ω cm(2) at 700 °C with Bi doping. The perovskite with x = 0.4 is suggested as the most promising composition as solid oxide fuel cell cathode material since it has demonstrated high electrical conductivity and low interfacial polarization resistance.

  15. Oxidation of evaporated porous silicon rugate filters.

    PubMed

    Robbie, Kevin; Cui, Yan; Elliott, Chelsea; Kaminska, Kate

    2006-11-10

    Rugate filters are thin-film optical interference coatings with sinusoidal variation of the refractive index. Several of these filters were fabricated with glancing angle deposition, which exploits atomic competition during growth to create nanoporous materials with controllable effective refractive index. This method enables the fabrication of devices with almost arbitrary refractive index profiles varying between the ambient, 1.0, and the index of the film material, in this case silicon with an index of 4.0 (at 600 nm). As these filters are inherently porous, oxidation of the silicon can occur throughout the device layer, and here we study the intentional oxidation of silicon filters by high-temperature reaction with gaseous oxygen. We find that a significant portion of the silicon filter oxidizes in approximately 10 min when heated to 600 degrees C-650 degrees C in an oxygen environment; oxidation then continues slowly over several hours. The presence of water vapor has little apparent effect on the oxidation reaction, and attempts to oxidize with ozone at room temperature were unsuccessful. As silicon filters oxidize to become silica, spectral blueshifts and increased short-wavelength transmittance are observed. Measured and calculated transmittance spectra generally agree, although the lack of absorption and dispersion in the theoretical model limits detailed comparison.

  16. Tribochemistry of Bismuth and Bismuth Salts for Solid Lubrication.

    PubMed

    Gonzalez-Rodriguez, Pablo; van den Nieuwenhuijzen, Karin J H; Lette, Walter; Schipper, Dik J; Ten Elshof, Johan E

    2016-03-23

    One of the main trends in the past decades is the reduction of wastage and the replacement of toxic compounds in industrial processes. Some soft metallic particles can be used as nontoxic solid lubricants in high-temperature processes. The behavior of bismuth metal particles, bismuth sulfide (Bi2S3), bismuth sulfate (Bi2(SO4)3), and bismuth oxide (Bi2O3) as powder lubricants was studied in a range of temperatures up to 580 °C. The mechanical behavior was examined using a high-temperature pin-on-disc setup, with which the friction force between two flat-contact surfaces was recorded. The bismuth-lubricated surfaces showed low coefficients of friction (μ ≈ 0.08) below 200 °C. Above the melting temperature of the metal powder at 271 °C, a layer of bismuth oxide developed and the friction coefficient increased. Bismuth oxide showed higher friction coefficients at all temperatures. Bismuth sulfide exhibited partial oxidation upon heating but the friction coefficient decreased to μ ≈ 0.15 above 500 °C, with the formation of bismuth oxide-sulfate, while some bismuth sulfate remained. All surfaces were studied by X-ray diffraction (XRD), confocal microscopy, high-resolution scanning electron microscopy (HR-SEM), and energy-dispersive X-ray spectroscopy (EDS). This study reveals how the partial oxidation of bismuth compounds at high temperatures affects their lubrication properties, depending on the nature of the bismuth compound. PMID:26936490

  17. Oxidation mechanism of T91 steel in liquid lead-bismuth eutectic: with consideration of internal oxidation

    NASA Astrophysics Data System (ADS)

    Ye, Zhongfei; Wang, Pei; Dong, Hong; Li, Dianzhong; Zhang, Yutuo; Li, Yiyi

    2016-10-01

    Clarification of the microscopic events that occur during oxidation is of great importance for understanding and consequently controlling the oxidation process. In this study the oxidation product formed on T91 ferritic/martensitic steel in oxygen saturated liquid lead-bismuth eutectic (LBE) at 823 K was characterized at the nanoscale using focused-ion beam and transmission electron microscope. An internal oxidation zone (IOZ) under the duplex oxide scale has been confirmed and characterized systematically. Through the microscopic characterization of the IOZ and the inner oxide layer, the micron-scale and nano-scale diffusion of Cr during the oxidation in LBE has been determined for the first time. The micron-scale diffusion of Cr ensures the continuous advancement of IOZ and inner oxide layer, and nano-scale diffusion of Cr gives rise to the typical appearance of the IOZ. Finally, a refined oxidation mechanism including the internal oxidation and the transformation of IOZ to inner oxide layer is proposed based on the discussion. The proposed oxidation mechanism succeeds in bridging the gap between the existing models and experimental observations.

  18. Oxidation mechanism of T91 steel in liquid lead-bismuth eutectic: with consideration of internal oxidation

    PubMed Central

    Ye, Zhongfei; Wang, Pei; Dong, Hong; Li, Dianzhong; Zhang, Yutuo; Li, Yiyi

    2016-01-01

    Clarification of the microscopic events that occur during oxidation is of great importance for understanding and consequently controlling the oxidation process. In this study the oxidation product formed on T91 ferritic/martensitic steel in oxygen saturated liquid lead-bismuth eutectic (LBE) at 823 K was characterized at the nanoscale using focused-ion beam and transmission electron microscope. An internal oxidation zone (IOZ) under the duplex oxide scale has been confirmed and characterized systematically. Through the microscopic characterization of the IOZ and the inner oxide layer, the micron-scale and nano-scale diffusion of Cr during the oxidation in LBE has been determined for the first time. The micron-scale diffusion of Cr ensures the continuous advancement of IOZ and inner oxide layer, and nano-scale diffusion of Cr gives rise to the typical appearance of the IOZ. Finally, a refined oxidation mechanism including the internal oxidation and the transformation of IOZ to inner oxide layer is proposed based on the discussion. The proposed oxidation mechanism succeeds in bridging the gap between the existing models and experimental observations. PMID:27734928

  19. Single crystal functional oxides on silicon

    PubMed Central

    Bakaul, Saidur Rahman; Serrao, Claudy Rayan; Lee, Michelle; Yeung, Chun Wing; Sarker, Asis; Hsu, Shang-Lin; Yadav, Ajay Kumar; Dedon, Liv; You, Long; Khan, Asif Islam; Clarkson, James David; Hu, Chenming; Ramesh, Ramamoorthy; Salahuddin, Sayeef

    2016-01-01

    Single-crystalline thin films of complex oxides show a rich variety of functional properties such as ferroelectricity, piezoelectricity, ferro and antiferromagnetism and so on that have the potential for completely new electronic applications. Direct synthesis of such oxides on silicon remains challenging because of the fundamental crystal chemistry and mechanical incompatibility of dissimilar interfaces. Here we report integration of thin (down to one unit cell) single crystalline, complex oxide films onto silicon substrates, by epitaxial transfer at room temperature. In a field-effect transistor using a transferred lead zirconate titanate layer as the gate insulator, we demonstrate direct reversible control of the semiconductor channel charge with polarization state. These results represent the realization of long pursued but yet to be demonstrated single-crystal functional oxides on-demand on silicon. PMID:26853112

  20. The efficiacy of bismuth subnitrate against genotoxicity and oxidative stress induced by aluminum sulphate.

    PubMed

    Turkez, Hasan; Geyikoglu, Fatime

    2011-03-01

    Aluminum (Al) is commonly used in industrial processes and drugs and is thought to induce erythrocytes damage via activation of oxidative stress. Recently, bismuth (Bi)-containing drugs are used in the treatment of various diseases. However, uncertain effects of Bi in blood tissue may participate in the therapeutic efficacy of Bi compounds as related to metals. Hence, this study aimed to determine the roles on human blood cells of the various concentrations of aluminum sulphate (Al(2)(SO(4))(3)) and bismuth subnitrate (BSN), separate and together. With this aim, oxidative status was assessed on erythrocytes by measuring following oxidative stress markers: reduced glutathione (GSH), superoxide dismutase (SOD), glucose-6-phosphate dehydrogenase (G-6-PDH) and catalase (CAT). Two chemicals were tested for their ability to induce cytogenetic change in human lymphocytes using assays for chromosome aberrations (CAs) and sister chromatid exchanges (SCEs). Our results showed that high dose of Al(2)(SO(4))(3) (20 µg/mL) caused oxidative stress and increased CA and SCE frequencies. Whereas, BSN doses did not change CA and SCE rates. Moreover, it led to changes of antioxidant capacity at different concentrations. After concomitant treatment with Al(2)(SO(4))(3) and BSN, the effects of BSN doses were different on enzyme activities and decreased the genotoxic damage. However, the high dose of BSN and Al(2)(SO(4))(3) was shown to enhance the frequencies of CAs and SCEs in a synergistic manner. In conclusion, BSN could be effective in the protection against the blood toxicity of Al(2)(SO(4))(3).

  1. Incorporation of thiosemicarbazide in Amberlite IRC-50 for separation of astatine from alpha-irradiated bismuth oxide.

    PubMed

    Roy, Kamalika; Basu, S; Ramaswami, A; Nayak, Dalia; Lahiri, Susanta

    2004-06-01

    A chelating resin was synthesized by incorporating thiosemicarbazide into Amberlite IRC-50, a weakly acidic polymer. Astatine radionuclides produced by alpha-irradiating bismuth oxide were separated using the newly synthesized chelating resin. The resin showed high selectivity for astatine. The adsorbed astatine was recovered using 0.1M EDTA at pH approximately 10. PMID:15110342

  2. Incorporation of thiosemicarbazide in Amberlite IRC-50 for separation of astatine from alpha-irradiated bismuth oxide.

    PubMed

    Roy, Kamalika; Basu, S; Ramaswami, A; Nayak, Dalia; Lahiri, Susanta

    2004-06-01

    A chelating resin was synthesized by incorporating thiosemicarbazide into Amberlite IRC-50, a weakly acidic polymer. Astatine radionuclides produced by alpha-irradiating bismuth oxide were separated using the newly synthesized chelating resin. The resin showed high selectivity for astatine. The adsorbed astatine was recovered using 0.1M EDTA at pH approximately 10.

  3. Low activation energy dehydrogenation of aqueous formic acid on platinum-ruthenium-bismuth oxide at near ambient temperature and pressure.

    PubMed

    Ting, Siu-Wa; Cheng, Shaoan; Tsang, Kwok-Ying; van der Laak, Nicole; Chan, Kwong-Yu

    2009-12-21

    Highly selective dehydrogenation of formic acid in water was observed at near ambient temperature on a metal/metal oxide catalyst composed of platinum ruthenium and bismuth with a low activation energy of 37.3 kJ mol(-1). PMID:20024219

  4. Oxide driven strength evolution of silicon surfaces

    SciTech Connect

    Grutzik, Scott J.; Zehnder, Alan T.; Milosevic, Erik; Boyce, Brad L.

    2015-11-21

    Previous experiments have shown a link between oxidation and strength changes in single crystal silicon nanostructures but provided no clues as to the mechanisms leading to this relationship. Using atomic force microscope-based fracture strength experiments, molecular dynamics modeling, and measurement of oxide development with angle resolved x-ray spectroscopy we study the evolution of strength of silicon (111) surfaces as they oxidize and with fully developed oxide layers. We find that strength drops with partial oxidation but recovers when a fully developed oxide is formed and that surfaces intentionally oxidized from the start maintain their high initial strengths. MD simulations show that strength decreases with the height of atomic layer steps on the surface. These results are corroborated by a completely separate line of testing using micro-scale, polysilicon devices, and the slack chain method in which strength recovers over a long period of exposure to the atmosphere. Combining our results with insights from prior experiments we conclude that previously described strength decrease is a result of oxidation induced roughening of an initially flat silicon (1 1 1) surface and that this effect is transient, a result consistent with the observation that surfaces flatten upon full oxidation.

  5. Bismuth oxide thin films prepared by chemical bath deposition (CBD) method: annealing effect

    NASA Astrophysics Data System (ADS)

    Gujar, T. P.; Shinde, V. R.; Lokhande, C. D.; Mane, R. S.; Han, Sung-Hwan

    2005-08-01

    Bismuth oxide thin films have been deposited by room temperature chemical bath deposition (CBD) method and annealed at 623 K in air. They were characterized for structural, surface morphological, optical and electrical properties. From the X-ray diffraction patterns, it was found that after annealing a non-stoichiometric phase, Bi 2O 2.33, was removed and phase pure monoclinic Bi 2O 3 was obtained. Surface morphology of Bi 2O 3 film at lower magnification SEM showed rod-like structure, however, higher magnification showed a rectangular slice-like structure perpendicular to substrate, giving rise to microrods on the surface. The optical studies showed the decrease in band gap by 0.3 eV after annealing. The electrical resistivity variation showed semiconductor behavior and from thermoemf measurements, the electrical conductivity was found to be of n-type.

  6. Broadly tunable multiwavelength fiber laser with bismuth-oxide EDF using large effective area fiber

    NASA Astrophysics Data System (ADS)

    Ramzia Salem, A. M.; Al-Mansoori, M. H.; Hizam, H.; Mohd Noor, S. B.; Mahdi, M. A.

    2011-02-01

    A multiwavelength laser comb using 2.49 m Bismuth-oxide erbium-doped fiber (Bi-EDF) with different lengths of large effective area fiber (LEAF) in a ring cavity configuration is realized. The Bi-EDF is used as the linear gain medium and LEAF is used as the non-linear gain medium for stimulated Brillouin scattering. Out of the four different lengths, the longest length of 25 km LEAF exhibits the widest tuning range of 44 nm (1576 to 1620 nm) in the L-band at 264 mW pump power and 5 mW Brillouin pump power. In addition, a total of 15 output channels are achieved with total average output power of -8 dBm from this laser structure. All Brillouin Stokes signals exhibit high peak power of above -20 dBm per signal and their optical signal-to-noise ratio of greater than 15 dB.

  7. Silicon Carbide Nanotube Oxidation at High Temperatures

    NASA Technical Reports Server (NTRS)

    Ahlborg, Nadia; Zhu, Dongming

    2012-01-01

    Silicon Carbide Nanotubes (SiCNTs) have high mechanical strength and also have many potential functional applications. In this study, SiCNTs were investigated for use in strengthening high temperature silicate and oxide materials for high performance ceramic nanocomposites and environmental barrier coating bond coats. The high · temperature oxidation behavior of the nanotubes was of particular interest. The SiCNTs were synthesized by a direct reactive conversion process of multiwall carbon nanotubes and silicon at high temperature. Thermogravimetric analysis (TGA) was used to study the oxidation kinetics of SiCNTs at temperatures ranging from 800degC to1300degC. The specific oxidation mechanisms were also investigated.

  8. Functionalised silicon oxide nanoparticles for fingermark detection.

    PubMed

    Moret, Sébastien; Bécue, Andy; Champod, Christophe

    2016-02-01

    Over the past decade, the use of nanotechnology for fingermark detection has been attracting a lot of attention. A substantial number of nanoparticle types has thus been studied and applied with varying success. However, despite all efforts, few publications present clear supporting evidence of their superiority over standard and commonly used techniques. This paper focuses on a rarely studied type of nanoparticles that regroups all desired properties for effective fingermark detection: silicon oxide. These nanoparticles offer optical and surface properties that can be tuned to provide optimal detection. This study explores their potential as a new method for fingermark detection. Detection conditions, outer functionalisations and optical properties were optimised and a first evaluation of the technique is presented. Dye-doped silicon oxide nanoparticles were assessed against a one-step luminescent cyanoacrylate. Both techniques were compared on natural fingermarks from three donors collected on four different non-porous substrates. On average, the two techniques performed similarly but silicon oxide detected marks with a better homogeneity and was less affected by donor inter-variability. The technique remains to be further optimised and yet silicon oxide nanoparticles already show great promises for effective fingermark detection.

  9. Visible light photooxidative performance of a high-nuclearity molecular bismuth vanadium oxide cluster.

    PubMed

    Tucher, Johannes; Streb, Carsten

    2014-01-01

    The visible light photooxidative performance of a new high-nuclearity molecular bismuth vanadium oxide cluster, H3[{Bi(dmso)3}4V13O40], is reported. Photocatalytic activity studies show faster reaction kinetics under anaerobic conditions, suggesting an oxygen-dependent quenching of the photoexcited cluster species. Further mechanistic analysis shows that the reaction proceeds via the intermediate formation of hydroxyl radicals which act as oxidant. Trapping experiments using ethanol as a hydroxyl radical scavenger show significantly decreased photocatalytic substrate oxidation in the presence of EtOH. Photocatalytic performance analyses using monochromatic visible light irradiation show that the quantum efficiency Φ for indigo photooxidation is strongly dependent on the irradiation wavelength, with higher quantum efficiencies being observed at shorter wavelengths (Φ395nm ca. 15%). Recycling tests show that the compound can be employed as homogeneous photooxidation catalyst multiple times without loss of catalytic activity. High turnover numbers (TON ca. 1200) and turnover frequencies up to TOF ca. 3.44 min(-1) are observed, illustrating the practical applicability of the cluster species. PMID:24991508

  10. Method of making silicon carbide-silicon composite having improved oxidation resistance

    NASA Technical Reports Server (NTRS)

    Luthra, Krishan Lal (Inventor); Wang, Hongyu (Inventor)

    2002-01-01

    A Silicon carbide-silicon matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is provided. A method is given for sealing matrix cracks in situ in melt infiltrated silicon carbide-silicon matrix composites. The composite cracks are sealed by the addition of various additives, such as boron compounds, into the melt infiltrated silicon carbide-silicon matrix.

  11. Silicon carbide-silicon composite having improved oxidation resistance and method of making

    NASA Technical Reports Server (NTRS)

    Luthra, Krishan Lal (Inventor); Wang, Hongyu (Inventor)

    1999-01-01

    A Silicon carbide-silicon matrix composite having improved oxidation resistance at high temperatures in dry or water-containing environments is provided. A method is given for sealing matrix cracks in situ in melt infiltrated silicon carbide-silicon matrix composites. The composite cracks are sealed by the addition of various additives, such as boron compounds, into the melt infiltrated silicon carbide-silicon matrix.

  12. Electrochemical and surface spectroscopic studies of thin films of bismuth ruthenium oxide (Bi{sub 2}Ru{sub 2}O{sub 7})

    SciTech Connect

    Wideloev, A.; Markovic, N.M.; Ross, P.N. Jr.

    1996-11-01

    Thin, nonporous films of bismuth ruthenium oxide having the pyrochlore crystal structure were prepared by ion beam deposition. The films were grown on metal disks machined to fit into a rotating ring-disk electrode. The electrocatalytic properties of these films for O{sub 2} reduction and evolution were studied in 1 M KOH using the rotating ring-disk electrode method in conjunction with spectroscopic studies of the surfaces before and after electrochemical analysis. The crystalline pyrochlore film was found to be an extremely poor oxygen reduction catalyst, but it could be activated in situ by a procedure that created a highly porous amorphous structure by dissolution of bismuth cations into the solution. The authors found in separate experiments that bismuth ions in solution increased the oxygen reduction activity of a nonporous ruthenium oxide surface, and suggest that there is an analogous effect on the activity of the residual, ruthenium-rich oxide surface by bismuth ions in solution following activation.

  13. Bismuth-catalyzed and doped silicon nanowires for one-pump-down fabrication of radial junction solar cells.

    PubMed

    Yu, Linwei; Fortuna, Franck; O'Donnell, Benedict; Jeon, Taewoo; Foldyna, Martin; Picardi, Gennaro; Roca i Cabarrocas, Pere

    2012-08-01

    Silicon nanowires (SiNWs) are becoming a popular choice to develop a new generation of radial junction solar cells. We here explore a bismuth- (Bi-) catalyzed growth and doping of SiNWs, via vapor-liquid-solid (VLS) mode, to fabricate amorphous Si radial n-i-p junction solar cells in a one-pump-down and low-temperature process in a single chamber plasma deposition system. We provide the first evidence that catalyst doping in the SiNW cores, caused by incorporating Bi catalyst atoms as n-type dopant, can be utilized to fabricate radial junction solar cells, with a record open circuit voltage of V(oc) = 0.76 V and an enhanced light trapping effect that boosts the short circuit current to J(sc) = 11.23 mA/cm(2). More importantly, this bi-catalyzed SiNW growth and doping strategy exempts the use of extremely toxic phosphine gas, leading to significant procedure simplification and cost reduction for building radial junction thin film solar cells. PMID:22822909

  14. Silica substrate or portion formed from oxidation of monocrystalline silicon

    DOEpatents

    Matzke, Carolyn M.; Rieger, Dennis J.; Ellis, Robert V.

    2003-07-15

    A method is disclosed for forming an inclusion-free silica substrate using a monocrystalline silicon substrate as the starting material and oxidizing the silicon substrate to convert it entirely to silica. The oxidation process is performed from both major surfaces of the silicon substrate using a conventional high-pressure oxidation system. The resulting product is an amorphous silica substrate which is expected to have superior etching characteristics for microfabrication than conventional fused silica substrates. The present invention can also be used to convert only a portion of a monocrystalline silicon substrate to silica by masking the silicon substrate and locally thinning a portion the silicon substrate prior to converting the silicon portion entirely to silica. In this case, the silica formed by oxidizing the thinned portion of the silicon substrate can be used, for example, as a window to provide optical access through the silicon substrate.

  15. Development of tellurium oxide and lead-bismuth oxide glasses for mid-wave infra-red transmission optics

    NASA Astrophysics Data System (ADS)

    Zhou, Beiming; Rapp, Charles F.; Driver, John K.; Myers, Michael J.; Myers, John D.; Goldstein, Jonathan; Utano, Rich; Gupta, Shantanu

    2013-03-01

    Heavy metal oxide glasses exhibiting high transmission in the Mid-Wave Infra-Red (MWIR) spectrum are often difficult to manufacture in large sizes with optimized physical and optical properties. In this work, we researched and developed improved tellurium-zinc-barium and lead-bismuth-gallium heavy metal oxide glasses for use in the manufacture of fiber optics, optical components and laser gain materials. Two glass families were investigated, one based upon tellurium and another based on lead-bismuth. Glass compositions were optimized for stability and high transmission in the MWIR. Targeted glass specifications included low hydroxyl concentration, extended MWIR transmission window, and high resistance against devitrification upon heating. Work included the processing of high purity raw materials, melting under controlled dry Redox balanced atmosphere, finning, casting and annealing. Batch melts as large as 4 kilograms were sprue cast into aluminum and stainless steel molds or temperature controlled bronze tube with mechanical bait. Small (100g) test melts were typically processed in-situ in a 5%Au°/95%Pt° crucible. Our group manufactured and evaluated over 100 different experimental heavy metal glass compositions during a two year period. A wide range of glass melting, fining, casting techniques and experimental protocols were employed. MWIR glass applications include remote sensing, directional infrared counter measures, detection of explosives and chemical warfare agents, laser detection tracking and ranging, range gated imaging and spectroscopy. Enhanced long range mid-infrared sensor performance is optimized when operating in the atmospheric windows from ~ 2.0 to 2.4μm, ~ 3.5 to 4.3μm and ~ 4.5 to 5.0μm.

  16. Enhancing the Performance of the Rechargeable Iron Electrode in Alkaline Batteries with Bismuth Oxide and Iron Sulfide Additives

    SciTech Connect

    Manohar, AK; Yang, CG; Malkhandi, S; Prakash, GKS; Narayanan, SR

    2013-09-07

    Iron-based alkaline rechargeable batteries have the potential of meeting the needs of large-scale electrical energy storage because of their low-cost, robustness and eco-friendliness. However, the widespread commercial deployment of iron-based batteries has been limited by the low charging efficiency and the poor discharge rate capability of the iron electrode. In this study, we have demonstrated iron electrodes containing bismuth oxide and iron sulfide with a charging efficiency of 92% and capable of being discharged at the 3C rate. Such a high value of charging efficiency combined with the ability to discharge at high rates is being reported for the first time. The bismuth oxide additive led to the in situ formation of elemental bismuth and a consequent increase in the overpotential for the hydrogen evolution reaction leading to an increase in the charging efficiency. We observed that the sulfide ions added to the electrolyte and iron sulfide added to the electrode mitigated-electrode passivation and allowed for continuous discharge at high rates. At the 3C discharge rate, a utilization of 0.2 Ah/g was achieved. The performance level of the rechargeable iron electrode demonstrated here is attractive for designing economically-viable large-scale energy storage systems based on alkaline nickel-iron and iron-air batteries. (C) 2013 The Electrochemical Society. All rights reserved.

  17. Easy synthesis of bismuth iron oxide nanoparticles as photocatalyst for solar hydrogen generation from water

    NASA Astrophysics Data System (ADS)

    Deng, Jinyi

    In this study, high purity bismuth iron oxide (BiFeO3/BFO) nanoparticles of size 50-80 nm have been successfully synthesized by a simple sol-gel method using urea and polyvinyl alcohol at low temperature. X-ray diffraction (XRD) measurement is used to optimize the synthetic process to get highly crystalline and pure phase material. Diffuse reflectance ultraviolet-visible (DRUV-Vis) spectrum indicates that the absorption cut-off wavelength of the nanoparticles is about 620 nm, corresponding to an energy band gap of 2.1 eV. Compared to BaTiO3, BFO has a better degradation of methyl orange under light radiation. Also, photocatalytic tests prove this material to be efficient towards water splitting under simulated solar light to generate hydrogen. The simple synthetic methodology adopted in this paper will be useful in developing low-cost semiconductor materials as effective photocatalysts for hydrogen generation. Photocatalytic tests followed by gas chromatography (GC) analyses show that BiFeO3 generates three times more hydrogen than commercial titania P25 catalyst under the same experimental conditions.

  18. Fouling Study of Silicon Oxide Pores Exposed to Tap Water

    SciTech Connect

    Nilsson, J.; Bourcier, W.L.; Lee, J.R.I.; Letant, S.E.; /LLNL, Livermore

    2007-07-12

    We report on the fouling of Focused Ion Beam (FIB)-fabricated silicon oxide nanopores after exposure to tap water for two weeks. Pore clogging was monitored by Scanning Electron Microscopy (SEM) on both bare silicon oxide and chemically functionalized nanopores. While fouling occurred on hydrophilic silicon oxide pore walls, the hydrophobic nature of alkane chains prevented clogging on the chemically functionalized pore walls. These results have implications for nanopore sensing platform design.

  19. Structural, electrical and magnetic measurements on oxide layers grown on 316L exposed to liquid lead-bismuth eutectic

    NASA Astrophysics Data System (ADS)

    Hosemann, Peter; Hofer, Christian; Hlawacek, Gregor; Li, Ning; Maloy, Stuart A.; Teichert, Christian

    2012-02-01

    Fast reactors and spallation neutron sources may use lead-bismuth eutectic (LBE) as a coolant. Its physical, chemical, and irradiation properties make it a safe coolant compared to Na cooled designs. However, LBE is a corrosive medium for most steels and container materials. The present study was performed to evaluate the corrosion behavior of the austenitic steel 316L (in two different delivery states). Detailed atomic force microscopy, magnetic force microscopy, conductive atomic force microscopy, and scanning transmission electron microscopy analyses have been performed on the oxide layers to get a better understanding of the corrosion and oxidation mechanisms of austenitic and ferritic/martensitic stainless steel exposed to LBE. The oxide scale formed on the annealed 316L material consisted of multiple layers with different compositions, structures, and properties. The innermost oxide layer maintained the grain structure of what used to be the bulk steel material and shows two phases, while the outermost oxide layer possessed a columnar grain structure.

  20. Thermoelectrics from silicon nanoparticles: the influence of native oxide

    NASA Astrophysics Data System (ADS)

    Petermann, Nils; Stötzel, Julia; Stein, Niklas; Kessler, Victor; Wiggers, Hartmut; Theissmann, Ralf; Schierning, Gabi; Schmechel, Roland

    2015-06-01

    Thermoelectric materials were synthesized by current-assisted sintering of doped silicon nanoparticles produced in a microwave-plasma reactor. Due to their affinity to oxygen, the nanoparticles start to oxidize when handled in air and even a thin surface layer of native silicon oxide leads to a significant increase in the oxide volume ratio. This results in a considerable incorporation of oxygen into the sintered pellets, thus affecting the thermoelectric performance. To investigate the necessity of inert handling of the raw materials, the thermoelectric transport properties of sintered nanocrystalline silicon samples were characterized with respect to their oxygen content. An innovative method allowing a quantitative silicon oxide analysis by means of electron microscopy was applied: the contrast between areas of high and low electrical conductivity was attributed to the silicon matrix and silicon oxide precipitates, respectively. Thermoelectric characterization revealed that both, electron mobility and thermal conductivity decrease with increasing silicon oxide content. A maximum figure of merit with zT = 0.45 at 950 °C was achieved for samples with a silicon oxide mass fraction of 9.5 and 21.4% while the sample with more than 25% of oxygen clearly indicates a negative impact of the oxygen on the electron mobility. Contribution to the Topical Issue "Silicon and Silicon-related Materials for Thermoelectricity", edited by Dario Narducci.

  1. Adaptive behaviour of silicon oxide memristive nanostructures

    NASA Astrophysics Data System (ADS)

    Korolev, D. S.; Mikhaylov, A. N.; Belov, A. I.; Sergeev, V. A.; Antonov, I. N.; Gorshkov, O. N.; Tetelbaum, D. I.

    2016-08-01

    The response to electrical pulses of various parameters has been studied for the CMOS-compatible memristive nanostructures on the basis of silicon oxide demonstrating reproducible resistive switching. It is established that an increase in the amplitude or width of a single programming pulse is followed by the gradual decrease in the device resistivity. By applying periodic pulse sequences of different polarity it is possible to obtain both lower and higher resistance states. This adaptive behavior is analogous to synaptic plasticity and considered as one of the main conditions for the application of memristive devices in neuromorphic systems and synaptic electronics.

  2. The Active Oxidation of Silicon Carbide

    NASA Technical Reports Server (NTRS)

    Jacobson, Nathan S.; Myers, Dwight L.

    2009-01-01

    The high temperature oxidation of silicon carbide occurs in two very different modes. Passive oxidation forms a protective oxide film which limits further attack of the SiC: SiC(s) + 3/2 O2(g) = SiO2(s) + CO(g) Active oxidation forms a volatile oxide and may lead to extensive attack of the SiC: SiC(s) + O2(g) = SiO(g) + CO(g) Generally passive oxidation occurs at higher oxidant pressures and active oxidation occurs at lower oxidant pressures and elevated temperatures. Active oxidation is a concern for reentry, where the flight trajectory involves the latter conditions. Thus the transition points and rates of active oxidation are a major concern. Passive/active transitions have been studied by a number of investigators. An examination of the literature indicates many questions remain regarding the effect of impurity, the hysteresis of the transition (i.e. the difference between active-to-passive and passive-toactive), and the effect of total pressure. In this study we systematically investigate each of these effects. Experiments were done in both an alumina furnace tube and a quartz furnace tube. It is known that alumina tubes release impurities such as sodium and increase the kinetics in the passive region [1]. We have observed that the active-to-passive transition occurs at a lower oxygen pressure when the experiment is conducted in alumina tubes and the resultant passive silica scale contains sodium. Thus the tests in this study are conducted in quartz tubes. The hysteresis of the transition has been discussed in the detail in the original theoretical treatise of this problem for pure silicon by Wagner [2], yet there is little mention of it in subsequent literature. Essentially Wagner points out that the active-to-passive transition is governed by the criterion for a stable Si/SiO2 equilibria and the passive-to-active transition is governed by the decomposition of the SiO2 film. A series of experiments were conducted for active-to-passive and passive

  3. Ultrafast laser functionalized rare phased gold-silicon/silicon oxide nanostructured hybrid biomaterials.

    PubMed

    Premnath, P; Tan, B; Venkatakrishnan, K

    2015-12-01

    We introduce a hybrid nanostructured biomaterial that is a combination of rare phases of immiscible gold and silicon oxide, functionalized via ultrafast laser synthesis. For the first time, we show cancer controlling properties of rare phases of gold silicides, which include Au7Si, Au5Si, Au0.7Si2.3 and Au8Si2. Conventionally, pure forms of gold and silicon/silicon oxide are extensively employed in targeted therapy and drug delivery systems due to their unique properties. While silicon and silicon oxide nanoparticles have shown biocompatibility, gold nanoparticles show conflicting results based on their size and material properties. Several studies have shown that gold and silicon combinations produce cell controlling properties, however, these studies were not able to produce a homogenous combination of gold and silicon, owing to its immiscibility. A homogenous combination of gold and silicon may potentially enable properties that have not previously been reported. We describe rare phased gold-silicon oxide nanostructured hybrid biomaterials and its unique cancer controlling properties, owing to material properties, concentration, size and density. The gold-silicon oxide nanostructured hybrid is composed of individual gold-silicon oxide nanoparticles in various concentrations of gold and silicon, some nanoparticles possess a gold-core and silicon-shell like structure. The individual nanoparticles are bonded together forming a three dimensional nanostructured hybrid. The interaction of the nanostructured hybrids with cervical cancer cells showed a 96% reduction in 24h. This engineered nanostructured hybrid biomaterial presents significant potential due to the combination of immiscible gold and silicon oxide in varying phases and can potentially satiate the current vacuum in cancer therapy.

  4. Ultrafast laser functionalized rare phased gold-silicon/silicon oxide nanostructured hybrid biomaterials.

    PubMed

    Premnath, P; Tan, B; Venkatakrishnan, K

    2015-12-01

    We introduce a hybrid nanostructured biomaterial that is a combination of rare phases of immiscible gold and silicon oxide, functionalized via ultrafast laser synthesis. For the first time, we show cancer controlling properties of rare phases of gold silicides, which include Au7Si, Au5Si, Au0.7Si2.3 and Au8Si2. Conventionally, pure forms of gold and silicon/silicon oxide are extensively employed in targeted therapy and drug delivery systems due to their unique properties. While silicon and silicon oxide nanoparticles have shown biocompatibility, gold nanoparticles show conflicting results based on their size and material properties. Several studies have shown that gold and silicon combinations produce cell controlling properties, however, these studies were not able to produce a homogenous combination of gold and silicon, owing to its immiscibility. A homogenous combination of gold and silicon may potentially enable properties that have not previously been reported. We describe rare phased gold-silicon oxide nanostructured hybrid biomaterials and its unique cancer controlling properties, owing to material properties, concentration, size and density. The gold-silicon oxide nanostructured hybrid is composed of individual gold-silicon oxide nanoparticles in various concentrations of gold and silicon, some nanoparticles possess a gold-core and silicon-shell like structure. The individual nanoparticles are bonded together forming a three dimensional nanostructured hybrid. The interaction of the nanostructured hybrids with cervical cancer cells showed a 96% reduction in 24h. This engineered nanostructured hybrid biomaterial presents significant potential due to the combination of immiscible gold and silicon oxide in varying phases and can potentially satiate the current vacuum in cancer therapy. PMID:26539809

  5. Dissolution and oxidation behaviour of various austenitic steels and Ni rich alloys in lead-bismuth eutectic at 520 °C

    NASA Astrophysics Data System (ADS)

    Roy, Marion; Martinelli, Laure; Ginestar, Kevin; Favergeon, Jérôme; Moulin, Gérard

    2016-01-01

    Ten austenitic steels and Ni rich alloys were tested in static lead-bismuth eutectic (LBE) at 520 °C in order to obtain a selection of austenitic steels having promising corrosion behaviour in LBE. A test of 1850 h was carried out with a dissolved oxygen concentration between 10-9 and 5 10-4 g kg-1. The combination of thermodynamic of the studied system and literature results leads to the determination of an expression of the dissolved oxygen content in LBE as a function of temperature: RT(K)ln[O](wt%) = -57584/T(K) -55.876T(K) + 254546 (R is the gas constant in J mol-1 K-1). This relation can be considered as a threshold of oxygen content above which only oxidation is observed on the AISI 316L and AISI 304L austenitic alloys in static LBE between 400 °C and 600 °C. The oxygen content during the test leads to both dissolution and oxidation of the samples during the first 190 h and leads to pure oxidation for the rest of the test. Results of mixed oxidation and dissolution test showed that only four types of corrosion behaviour were observed: usual austenitic steels and Ni rich alloys behaviour including the reference alloy 17Cr-12Ni-2.5Mo (AISI 316LN), the 20Cr-31Ni alloy one, the Si containing alloy one and the Al containing alloy one. According to the proposed criteria of oxidation and dissolution kinetics, silicon rich alloys and aluminum rich alloy presented a promising corrosion behaviour.

  6. Infrared Dielectric Properties of Low-Stress Silicon Oxide

    NASA Technical Reports Server (NTRS)

    Cataldo, Giuseppe; Wollack, Edward J.; Brown, Ari D.; Miller, Kevin H.

    2016-01-01

    Silicon oxide thin films play an important role in the realization of optical coatings and high-performance electrical circuits. Estimates of the dielectric function in the far- and mid-infrared regime are derived from the observed transmittance spectrum for a commonly employed low-stress silicon oxide formulation. The experimental, modeling, and numerical methods used to extract the dielectric function are presented.

  7. Silicon radiation detectors with oxide charge state compensation

    SciTech Connect

    Walton, J.T.; Goulding, F.S.

    1986-10-01

    This paper discusses the use of boron implantation on high resistivity P-type silicon before oxide growth to compensate for the presence of charge states in the oxide and oxide/silicon interface. The presence of these charge states on high resistivity P-type silicon produces an inversion layer which causes high leakage currents on N/sup +/P junctions and high surface conductance. Compensating the surface region by boron implantation is shown to result in oxide passivated N/sup +/P junctions with very low leakage currents and with low surface conductance.

  8. Laser-induced oxidation kinetics of bismuth surface microdroplets on GaAsBi studied in situ by Raman microprobe analysis.

    PubMed

    Steele, J A; Lewis, R A

    2014-12-29

    We report the cw-laser-induced oxidation of molecular-beam-epitaxy grown GaAsBi bismuth surface microdroplets investigated in situ by micro-Raman spectroscopy under ambient conditions as a function of irradiation power and time. Our results reveal the surface droplets are high-purity crystalline bismuth and the resultant Bi2O3 transformation to be β-phase and stable at room temperature. A detailed Raman study of Bi microdroplet oxidation kinetics yields insights into the laser-induced oxidation process and offers useful real-time diagnostics. The temporal evolution of new β-Bi2O3 Raman modes is shown to be well described by Johnson-Mehl-Avrami-Kolmogorov kinetic transformation theory and while this study limits itself to the laser-induced oxidation of GaAsBi bismuth surface droplets, the results will find application within the wider context of bismuth laser-induced oxidation and direct Raman laser processing.

  9. Nitric oxide-releasing porous silicon nanoparticles.

    PubMed

    Kafshgari, Morteza Hasanzadeh; Cavallaro, Alex; Delalat, Bahman; Harding, Frances J; McInnes, Steven Jp; Mäkilä, Ermei; Salonen, Jarno; Vasilev, Krasimir; Voelcker, Nicolas H

    2014-01-01

    In this study, the ability of porous silicon nanoparticles (PSi NPs) to entrap and deliver nitric oxide (NO) as an effective antibacterial agent is tested against different Gram-positive and Gram-negative bacteria. NO was entrapped inside PSi NPs functionalized by means of the thermal hydrocarbonization (THC) process. Subsequent reduction of nitrite in the presence of d-glucose led to the production of large NO payloads without reducing the biocompatibility of the PSi NPs with mammalian cells. The resulting PSi NPs demonstrated sustained release of NO and showed remarkable antibacterial efficiency and anti-biofilm-forming properties. These results will set the stage to develop antimicrobial nanoparticle formulations for applications in chronic wound treatment.

  10. Nitric oxide-releasing porous silicon nanoparticles

    NASA Astrophysics Data System (ADS)

    Kafshgari, Morteza Hasanzadeh; Cavallaro, Alex; Delalat, Bahman; Harding, Frances J.; McInnes, Steven JP; Mäkilä, Ermei; Salonen, Jarno; Vasilev, Krasimir; Voelcker, Nicolas H.

    2014-07-01

    In this study, the ability of porous silicon nanoparticles (PSi NPs) to entrap and deliver nitric oxide (NO) as an effective antibacterial agent is tested against different Gram-positive and Gram-negative bacteria. NO was entrapped inside PSi NPs functionalized by means of the thermal hydrocarbonization (THC) process. Subsequent reduction of nitrite in the presence of d-glucose led to the production of large NO payloads without reducing the biocompatibility of the PSi NPs with mammalian cells. The resulting PSi NPs demonstrated sustained release of NO and showed remarkable antibacterial efficiency and anti-biofilm-forming properties. These results will set the stage to develop antimicrobial nanoparticle formulations for applications in chronic wound treatment.

  11. Nitric oxide-releasing porous silicon nanoparticles

    PubMed Central

    2014-01-01

    In this study, the ability of porous silicon nanoparticles (PSi NPs) to entrap and deliver nitric oxide (NO) as an effective antibacterial agent is tested against different Gram-positive and Gram-negative bacteria. NO was entrapped inside PSi NPs functionalized by means of the thermal hydrocarbonization (THC) process. Subsequent reduction of nitrite in the presence of d-glucose led to the production of large NO payloads without reducing the biocompatibility of the PSi NPs with mammalian cells. The resulting PSi NPs demonstrated sustained release of NO and showed remarkable antibacterial efficiency and anti-biofilm-forming properties. These results will set the stage to develop antimicrobial nanoparticle formulations for applications in chronic wound treatment. PMID:25114633

  12. Low temperature oxidation of crystalline silicon using excimer laser irradiation

    NASA Astrophysics Data System (ADS)

    Nayar, Vishal; Boyd, Ian W.; Goodall, F. N.; Arthur, G.

    In this paper we present a study of ultra-violet laser oxidation of silicon at low temperature (< 650° C), using both 249 and 193 nm radiation. Calculation of the surface temperature rise during the laser pulses suggests that non-thermal oxidation mechanisms are present. In addition to the growth of planar thin oxides over macroscopic areas, a new technique for selectivity oxidising silicon by direct image projection, i.e., direct growth lithography (DGL) is also preliminarily presented.

  13. The photorefractive characteristics of bismuth-oxide doped lithium niobate crystals

    SciTech Connect

    Zheng, Dahuai; Yao, Jiaying; Kong, Yongfa; Liu, Shiguo; Zhang, Ling; Chen, Shaolin; Xu, Jingjun

    2015-01-15

    Bismuth-doped lithium niobate (LN:Bi) crystals were grown by Czochralski method and their optical damage resistance, photorefraction, absorption spectra, and defect energy levels were investigated. The experimental results indicate that the photorefractive properties of LN:Bi were enhanced as compared with congruent one, the photorefractive response time was greatly shortened, the photorefractive sensitivity was increased, and the diffraction efficiency of near-stoichiometric LN:Bi (SLN:Bi) reached 31.72% and 49.08% at 532 nm and 488 nm laser, respectively (light intensity of 400 mW/cm{sup 2}). An absorption peak at about 350 nm was observed in the absorption spectrum of LN:Bi. And the defect energy levels simulation indicates new defect levels appear in the forbidden gap of LN:Bi crystals. Therefore bismuth can act as photorefractive centers in LN crystals.

  14. Investigation of oxidative coupling of methane over bismuth oxychloride, samarium chloride, or manganese chloride supported on lithium carbonate-magnesia systems

    SciTech Connect

    Khan, A.Z.; Ruckenstein, E. )

    1992-11-01

    The magnesia-supported bismuth oxychloride with lithium carbonate present is significantly more effective and stable with time-on-stream than the unsupported or supported systems free of Li[sub 2]CO[sub 3] in the oxidative coupling of methane at 750[degrees]C, P[sub CH[sub 4

  15. Growth of silicon quantum dots by oxidation of the silicon nanocrystals embedded within silicon carbide matrix

    SciTech Connect

    Kole, Arindam; Chaudhuri, Partha

    2014-10-15

    A moderately low temperature (≤800 °C) thermal processing technique has been described for the growth of the silicon quantum dots (Si-QD) within microcrystalline silicon carbide (μc-SiC:H) dielectric thin films deposited by plasma enhanced chemical vapour deposition (PECVD) process. The nanocrystalline silicon grains (nc-Si) present in the as deposited films were initially enhanced by aluminium induced crystallization (AIC) method in vacuum at a temperature of T{sub v} = 525 °C. The samples were then stepwise annealed at different temperatures T{sub a} in air ambient. Analysis of the films by FTIR and XPS reveal a rearrangement of the μc-SiC:H network has taken place with a significant surface oxidation of the nc-Si domains upon annealing in air. The nc-Si grain size (D{sub XRD}) as calculated from the XRD peak widths using Scherrer formula was found to decrease from 7 nm to 4 nm with increase in T{sub a} from 250 °C to 800 °C. A core shell like structure with the nc-Si as the core and the surface oxide layer as the shell can clearly describe the situation. The results indicate that with the increase of the annealing temperature in air the oxide shell layer becomes thicker and the nc-Si cores become smaller until their size reduced to the order of the Si-QDs. Quantum confinement effect due to the SiO covered nc-Si grains of size about 4 nm resulted in a photoluminescence peak due to the Si QDs with peak energy at 1.8 eV.

  16. Study of ternary-component bismuth molybdate catalysts by /sup 18/O/sub 2/ tracer in the oxidation of propylene to acrolein

    SciTech Connect

    Ueda, W.; Moro-oka, Y.; Ikawa, T.

    1981-08-01

    Participation of lattice oxide ions of ternary-component bismuth molybdate catalysts M-Bi-Mo-O (M = Ni, Co, Mg, Mn, Ca, Sr, Ba, and Pb) was investigated using the /sup 18/O/sub 2/ tracer in the selective oxidation of propylene to acrolein. The participation of the lattice oxide ions in the oxidation is prominent on every catalyst but the extent of the participation varies significantly depending on the structure of the catalyst. Only lattice oxide ions in the bismuth molybdate phase are incorporated into the oxidized products on the catalysts (M = Ni, Co, Mg, and Mn) where M have smaller ionic radius than Bi/sup 3 +/; catalyst particles are composed of a shell of bismuth molybdates and a core of MMoO/sub 4/. On the other hand, whole oxide ions in the active particles are involved in the oxidation on catalysts having a scheelite-type structure (M = Ca, Sr, Ba, and Pb) where M has a comparable ionic radius to Bi/sup 3 +/.

  17. Study of multiphasic molybdate-based catalysts. II. Synergy effect between bismuth molybdates and mixed iron and cobalt molybdates in mild oxidation of propene

    SciTech Connect

    Millet, J.M.M.; Ponceblanc, H.; Coudurier, G.; Vedrine, J.C. ); Herrmann, J.M. )

    1993-08-01

    Results are reported concerning the synergy effect observed in the oxidation of propene to acrolein over bismuth and mixed iron and cobalt molybdates. The pure bismuth, iron, and cobalt molybdates and mixed cobalt and iron molybdates (solid solutions) have been prepared and individually tested as catalysts. Mechanical mixtures of these phases have been prepared and tested as catalysts. All the catalysts have been characterized before and after the catalytic reaction by several techniques such as ESR, XPS, EDX-STEM, TEM, XRD, and Moessbauer and UV spectroscopies. The synergy effect observed is tentatively explained as due to the deposition on the large bismuth molybdate particles of smaller mixed iron and cobalt molybdate particles with spreading of the bismuth molybdate over the latter particles. It is proposed that the Fe[sub x]Co[sub 1-x]MoO[sub 4] phase plays the role of the fast electron conducting material which enhances the electron mobility and the efficiency of the redox mechanism, the active and selective phase being the overlying bismuth molybdate compounds. 27 refs., 5 figs., 7 tabs.

  18. Indium oxide/n-silicon heterojunction solar cells

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1982-12-28

    A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

  19. One-step synthesis of bismuth molybdate catalysts via flame spray pyrolysis for the selective oxidation of propylene to acrolein.

    PubMed

    Schuh, K; Kleist, W; Høj, M; Trouillet, V; Jensen, A D; Grunwaldt, J-D

    2014-12-18

    Flame spray pyrolysis (FSP) of Bi(III)- and Mo(VI)-2-ethylhexanoate dissolved in xylene resulted in various nanocrystalline bismuth molybdate phases depending on the Bi/Mo ratio. Besides α-Bi2Mo3O12 and γ-Bi2MoO6, FSP gave direct access to the metastable β-Bi2Mo2O9 phase with high surface area (19 m(2) g(-1)). This phase is normally only obtained at high calcination temperatures (>560 °C) resulting in lower surface areas. The β-phase was stable up to 400 °C and showed superior catalytic performance compared to α- and γ-phases in selective oxidation of propylene to acrolein at temperatures relevant for industrial applications (360 °C). PMID:25350295

  20. Ultrahigh-Q silicon resonators in a planarized local oxidation of silicon platform.

    PubMed

    Naiman, Alex; Desiatov, Boris; Stern, Liron; Mazurski, Noa; Shappir, Joseph; Levy, Uriel

    2015-05-01

    We describe a platform for the fabrication of smooth waveguides and ultrahigh-quality-factor (Q factor) silicon resonators using a modified local oxidation of silicon (LOCOS) technique. Unlike the conventional LOCOS process, our approach allows the fabrication of nearly planarized structures, supporting a multilayer silicon photonics configuration. Using this approach we demonstrate the fabrication and the characterization of a microdisk resonator with an intrinsic Q factor that is one of the highest Q factors achieved with a compact silicon-on-insulator platform.

  1. Discontinuous ion tracks on silicon oxide on silicon surfaces after grazing-angle heavy ion irradiation

    SciTech Connect

    Carvalho, A. M. J. F.; Marinoni, M.; Touboul, A. D.; Guasch, C.; Lebius, H.; Ramonda, M.; Bonnet, J.; Saigne, F.

    2007-02-12

    Thin silicon oxide layers on silicon have been characterized by atomic force microscopy before and after swift heavy ion irradiation with 0.63 MeV/u Pb ions at grazing angle of incidence. In this letter, the authors report the observation of extended intermittent tracks at the silicon oxide (SiO{sub 2}) surface. As a result, this raises the question of the discontinuous energy deposition at the nanometric scale. This experimental overlook is of major interest for nanostructuring and surface nanoprocessing as well as with regard to reliability of electronic components and systems.

  2. Enhancement of Er optical efficiency through bismuth sensitization in yttrium oxide

    SciTech Connect

    Scarangella, Adriana; Reitano, Riccardo; Franzò, Giorgia; Miritello, Maria; Priolo, Francesco

    2015-07-27

    The process of energy transfer (ET) between optically active ions has been widely studied to improve the optical efficiency of a system for different applications, from lighting and photovoltaics to silicon microphotonics. In this work, we report the influence of Bi on the Er optical emission in erbium-yttrium oxide thin films synthesized by magnetron co-sputtering. We demonstrate that this host permits to well dissolve Er and Bi ions, avoiding their clustering, and thus to stabilize the optically active Er{sup 3+} and Bi{sup 3+} valence states. In addition, we establish the ET occurrence from Bi{sup 3+} to Er{sup 3+} by the observed Bi{sup 3+} PL emission decrease and the simultaneous Er{sup 3+} photoluminescence (PL) emission increase. This was further confirmed by the coincidence of the Er{sup 3+} and Bi{sup 3+} excitation bands, analyzed by PL excitation spectroscopy. By increasing the Bi content of two orders of magnitude inside the host, though the occurrence of Bi-Bi interactions becomes deleterious for Bi{sup 3+} optical efficiency, the ET process between Bi{sup 3+} and Er{sup 3+} is still prevalent. We estimate ET efficiency of 70% for the optimized Bi:Er ratio equal to 1:3. Moreover, we have demonstrated to enhance the Er{sup 3+} effective excitation cross section by more than three orders of magnitude with respect to the direct one, estimating a value of 5.3 × 10{sup −18} cm{sup 2}, similar to the expected Bi{sup 3+} excitation cross section. This value is one of the highest obtained for Er in Si compatible hosts. These results make this material very promising as an efficient emitter for Si-compatible photonics devices.

  3. Nanostructured bismuth vanadate-based materials for solar-energy-driven water oxidation: a review on recent progress.

    PubMed

    Huang, Zhen-Feng; Pan, Lun; Zou, Ji-Jun; Zhang, Xiangwen; Wang, Li

    2014-11-01

    Water oxidation is the key step for both photocatalytic water splitting and CO₂ reduction, but its efficiency is very low compared with the photocatalytic reduction of water. Bismuth vanadate (BiVO₄) is the most promising photocatalyst for water oxidation and has become a hot topic for current research. However, the efficiency achieved with this material to date is far away from the theoretical solar-to-hydrogen conversion efficiency, mainly due to the poor photo-induced electron transportation and the slow kinetics of oxygen evolution. Fortunately, great breakthroughs have been made in the past five years in both improving the efficiency and understanding the related mechanism. This review is aimed at summarizing the recent experimental and computational breakthroughs in single crystals modified by element doping, facet engineering, and morphology control, as well as macro/mesoporous structure construction, and composites fabricated by homo/hetero-junction construction and co-catalyst loading. We aim to provide guidelines for the rational design and fabrication of highly efficient BiVO₄-based materials for water oxidation. PMID:25325232

  4. Formation of Mosaic Silicon Oxide Structure during Metal-Assisted Electrochemical Etching of Silicon at High Current Density

    NASA Astrophysics Data System (ADS)

    Cao, Dao Tran; Anh, Cao Tuan; Ngan, Luong Truc Quynh

    2016-05-01

    We have used constant-current, metal-assisted electrochemical etching of silicon in HF/H2O2/ethanol electrolyte to fabricate porous silicon. We found that, at large enough current density, the sponge-like porous silicon structure is replaced by a mosaic structure, which includes islands of various shapes emerging between trenches that have been etched downward. Energy-dispersive x-ray analysis showed that the surface of the mosaic pieces was covered with silicon oxide, while little silicon oxide developed on the surface of trenches. We suggest that the appearance of the mosaic structure can be explained by the increase in the oxidation rate of silicon when the anodic current density increases, combined with no change in the dissolution rate of silicon oxide into the solution. Consequently, above a certain value of anodic current density, there is sufficient residual silicon oxide on the etched surface to create a continuous thin film. However, if the silicon oxide layer is too thick (e.g., due to too high anodic current density or too long etching time), it will become cracked (formation of mosaic pieces), likely due to differences in thermal expansion coefficient between the amorphous silicon oxide layer and crystalline silicon substrate. The oxide is cracked at locations with many defects, and the cracks reveal the silicon substrate. Therefore, at the locations where cracks occur, etching will go sideways and downward, creating trenches.

  5. Multiwavelength L-band fiber laser with bismuth-oxide EDF and photonic crystal fiber

    NASA Astrophysics Data System (ADS)

    Ramzia Salem, A. M.; Al-Mansoori, M. H.; Hizam, H.; Mohd Noor, S. B.; Abu Bakar, M. H.; Mahdi, M. A.

    2011-05-01

    A multiwavelength laser comb using a bismuth-based erbium-doped fiber and 50 m photonic crystal fiber is demonstrated in a ring cavity configuration. The fiber laser is solely pumped by a single 1455 nm Raman pump laser to exploit its higher power delivery compared to that of a single-mode laser diode pump. At 264 mW Raman pump power and 1 mW Brillouin pump power, 38 output channels in the L-band have been realized with an optical signal-to-noise ratio above 15 dB and a Stokes line spacing of 0.08 nm. The laser exhibits a tuning range of 12 nm and produces stable Stokes lines across the tuning range between Brillouin pump wavelengths of 1603 nm and 1615 nm.

  6. Extension of silicon emission model to silicon pillar oxidation

    NASA Astrophysics Data System (ADS)

    Kageshima, Hiroyuki; Shiraishi, Kenji; Endoh, Tetsuo

    2016-08-01

    Missing Si in the oxidation of Si pillar structures is investigated by extending the Si emission model to the oxidation of planar structures. The original Si emission model [H. Kageshima et al., Jpn. J. Appl. Phys. 38, L971 (1999)] assumes the emission of excess Si from the interface into the oxide during the oxidation process, the diffusion of the excess Si through the oxide, and the control of the oxidation rate by the concentration of remaining excess Si around the interface. By assuming the sublimation of the excess Si from the oxide surface in addition to the assumptions of the original Si emission model, the origin of the missing Si is consistently explained. It is suggested that the amount of the missing Si is enhanced by the geometrical effect of the pillar structure because the concentration of excess Si is inversely proportional to the radial position. This also suggests that the missing Si is inevitable for the thin pillar structures. Careful approaches to the oxidation process are recommended for pillar structures.

  7. Growth model of lantern-like amorphous silicon oxide nanowires

    NASA Astrophysics Data System (ADS)

    Wu, Ping; Zou, Xingquan; Chi, Lingfei; Li, Qiang; Xiao, Tan

    2007-03-01

    Silicon oxide nanowire assemblies with lantern-like morphology were synthesized by thermal evaporation of the mixed powder of SnO2 and active carbon at 1000 °C and using the silicon wafer as substrate and source. The nano-lanterns were characterized by a scanning electron microscope (SEM), high-resolution transmission electron microscope (HRTEM), energy-dispersive spectroscope (EDS) and selective area electron diffraction (SAED). The results show that the nano-lantern has symmetrical morphology, with one end connecting with the silicon wafer and the other end being the tin ball. The diameter of the nano-lantern is about 1.5-3.0 µm. Arc silicon oxide nanowire assemblies between the two ends have diameters ranging from 70 to 150 nm. One single catalyst tin ball catalyzes more than one amorphous nanowires' growth. In addition, the growth mechanism of the nano-lantern is discussed and a growth model is proposed. The multi-nucleation sites round the Sn droplet's perimeter are responsible for the formation of many SiOx nanowires. The growing direction of the nanowires is not in the same direction of the movement of the catalyst tin ball, resulting in the bending of the nanowires and forming the lantern-like silicon oxide morphology. The controllable synthesis of the lantern-like silicon oxide nanostructure may have potential applications in the photoelectronic devices field.

  8. Carbon dioxide sensing mechanisms of an electrocatalytic sensor/cell based on a tungsten stabilized bismuth oxide solid electrolyte

    NASA Astrophysics Data System (ADS)

    Shoemaker, Erika Leigh

    This work describes the specific O2/CO2 sensing mechanisms of a solid-state, thick-film, electrocatalytic cermet (ceramic/metallic) gas sensor based on a tungsten stabilized bismuth oxide (WBO) solid electrolyte. The sensors embody the same configuration of classical planar oxygen sensors with two catalytic electrodes sandwiching an oxygen ion conducting solid electrolyte and a buried metal oxide reference. The technique of cyclic voltammetry is used where a cyclic voltage is ramped across the electrodes to promote electrochemical reactions on the surface of the sensor. These reactions alter the ionic current flow through the solid electrolyte, generating voltage-current related responses (voltammograms) which are gas specific. The WBO sensors have the identical configuration of previously investigated sensors of this type based on a yttria stabilized zirconia (YSZ) solid electrolyte which show good response to O 2 but do not respond to CO2 to any degree. This dissertation examines the specific function of each solid electrolyte layer and relates them to both the WBO sensors ability to respond uniquely to CO2 and the YSZ sensors incapability to respond to CO2. The research suggests that the tungsten component of the WBO electrolyte along with the porosity of the WBO layer together are responsible for the unique CO 2 response of this sensor.

  9. Investigation of gamma ray shielding efficiency and mechanical performances of concrete shields containing bismuth oxide as an environmentally friendly additive

    NASA Astrophysics Data System (ADS)

    Yao, Ya; Zhang, Xiaowen; Li, Mi; Yang, Rong; Jiang, Tianjiao; Lv, Junwen

    2016-10-01

    Concrete has a proven ability to attenuate gamma rays and neutrons without compromising structural property; therefore, it is widely used as the primary shielding material in many nuclear facilities. Recently, there is a tendency toward using various additives to enhance the shielding properties of these concrete mixtures. However, most of these additives being used either pose hygiene hazards or require special handling processes. It would be ideal if environmentally friendly additives were available for use. The bismuth oxide (Bi2O3) additive shows promise in various shielding applications due to its proven radiation attenuation ability and environmentally friendly nature. To the best of our knowledge, however, Bi2O3 has never been used in concrete mixtures. Therefore, for this research, we fabricated the Bi2O3-based concrete mixtures by adding Bi2O3 powder in the ordinary concrete mixture. Concrete mixtures with lead oxide (PbO) additives were used for comparison. Radiation shielding parameters like the linear attenuation coefficients (LAC) of all these concrete mixtures showing the effects of the Bi2O3 additions are presented. The mechanical performances of concrete mixtures incorporated with Bi2O3 additive were also investigated. It suggested that the concrete mixture containing 25% Bi2O3 powder (B5 in this study) provided the best shielding capacity and mechanical performance among other mixes. It has a significant potential for application as a structural concrete where radiological protection capability is required.

  10. Surface chemistry dependence of native oxidation formation on silicon nanocrystals

    SciTech Connect

    Liptak, R. W.; Campbell, S. A.; Kortshagen, U.

    2009-09-15

    The growth of silicon oxide on bare and SF{sub 6}-etched silicon nanocrystals (Si-NCs), which were synthesized by an all gas phase approach, was investigated by examining the surface chemistry and optical properties of the NCs over time. Consistent with previous work in the low temperature oxidation of silicon, the oxidation follows the Cabrera-Mott mechanism, and the measured data are well fitted to the Elovich equation. The use of the SF{sub 6} plasma is found to reduce the surface Si-H bond density and dramatically increase the monolayer growth rate. This is believed to be due to the much larger volatility of Si-F bonds compared to Si-H bonds on the surface of the NC.

  11. Optical properties of Lead bismuth borate glasses doped with neodymium oxide.

    PubMed

    Farouk, M; Abd El-Maboud, A; Ibrahim, M; Ratep, A; Kashif, I

    2015-10-01

    Neodymium doped Lead bismuth borate glasses with the composition of 25PbO-25Bi2O3-50B2O3:xNd2O3, where x=0.5, 1, 1.5 and 2 mol%, have been prepared by melt quenching technique. The behavior of the density and molar volume allows concluding that, addition of Nd2O3 leads to the formation of non-bridging oxygen. Rare earth ion parameters have been calculated and studied. The optical band gap (Eg), and band tails (Ee) were determined. Judd-Ofelt theory for the intensity analysis of induced electric dipole transitions has been applied to the measured oscillator strengths of the absorption bands to determine the three phenomenological intensity parameters Ω2, Ω4 and Ω6 for glass. It was observed that the deviation parameters, rms, was found to be 0.56:0.58(×10(-6)). The estimated Judd-Ofelt parameters were found to be Nd2O3concentration dependent. The hypersensitive transition, (4)I9/2→(4)G5/2+(2)G7/2, is closely related to Ω2 parameter.

  12. Zinc oxide varistors and/or resistors

    DOEpatents

    Arnold, Jr., Wesley D.; Bond, Walter D.; Lauf, Robert J.

    1993-01-01

    Varistors and/or resistors that includes doped zinc oxide gel microspheres. The doped zinc oxide gel microspheres preferably have from about 60 to about 95% by weight zinc oxide and from about 5 to about 40% by weight dopants based on the weight of the zinc oxide. The dopants are a plurality of dopants selected from silver salts, boron oxide, silicon oxide and hydrons oxides of aluminum, bismuth, cobalt, chromium, manganese, nickel, and antimony.

  13. Zinc oxide varistors and/or resistors

    DOEpatents

    Arnold, W.D. Jr.; Bond, W.D.; Lauf, R.J.

    1993-07-27

    Varistors and/or resistors are described that include doped zinc oxide gel microspheres. The doped zinc oxide gel microspheres preferably have from about 60 to about 95% by weight zinc oxide and from about 5 to about 40% by weight dopants based on the weight of the zinc oxide. The dopants are a plurality of dopants selected from silver salts, boron oxide, silicon oxide and hydrons oxides of aluminum, bismuth, cobalt, chromium, manganese, nickel, and antimony.

  14. Effect of Silicon Carbide Nanoparticles on the Grain Boundary Segregation and Thermoelectric Properties of Bismuth Doped Mg2Si0.7Ge0.3

    NASA Astrophysics Data System (ADS)

    Farahi, Nader; Prabhudev, Sagar; Bugnet, Matthieu; Botton, Gianluigi A.; Salvador, James R.; Kleinke, Holger

    2016-09-01

    The effect of silicon carbide (SiC) nanoparticles on the thermoelectric properties of Mg2Si0.676Ge0.3Bi0.024 was investigated. Increasing the concentration of SiC nanoparticles systematically reduces the electrical conductivity from 431 Ω-1 cm-1 for the pristine sample to 370 Ω-1 cm-1 for the sample with 1.5 wt.% SiC at 773 K, while enhancing the Seebeck coefficient from -202 μV K-1 to -215 μV K-1 at 773 K. In spite of the high thermal conductivity of SiC, its additions could successfully decrease the lattice thermal conductivity from 3.2 W m-1 K-1 to 2.7 W m-1 K-1 at 323 K, presumably by adding more interfaces. The Z contrast transmission electron microscopy imaging (Z = atomic number) and energy dispersive x-ray spectroscopy revealed bismuth segregation at the grain boundary. In summary, the figure of merit reached its maximum value of 0.75 at 773 K for the sample containing 0.5 wt.% SiC.

  15. Silicon-containing ferritic/martensitic steel after exposure to oxygen-containing flowing lead-bismuth eutectic at 450 and 550 °C

    NASA Astrophysics Data System (ADS)

    Schroer, Carsten; Koch, Verena; Wedemeyer, Olaf; Skrypnik, Aleksandr; Konys, Jürgen

    2016-02-01

    A ferritic/martensitic (f/m) steel with 9 and 3 mass% of chromium (Cr) and silicon (Si), respectively, was tested on performance in flowing lead-bismuth eutectic (LBE) at 450 and 550 °C, each at concentrations of solved oxygen of both 10-7 and 10-6 mass%. The 9Cr-3Si steel generally exhibits the same basic corrosion modes as other f/m materials with 9 mass% Cr and typically lower Si content, namely Steel T91. The Si-rich steel shows an overall improved performance in comparison to T91 at 450 °C and 10-7 mass% solved oxygen, but especially at 450 °C and 10-6 mass% solved oxygen. The advantage of higher Si-content in 9Cr steel is less clear at 550 °C. Especially high oxygen content in flowing LBE at 550 °C, between >10-6 mass% and oxygen saturation, seems detrimental for the high-Si material in respect of the initiation and progress of a solution-based corrosion.

  16. Synthesis of nanoscale silicon oxide oxidation state distributions: The transformation from hydrophilicity to hydrophobicity

    NASA Astrophysics Data System (ADS)

    Laminack, William; Gole, James L.; White, Mark G.; Ozdemir, Serdar; Ogden, Andrew G.; Martin, Holly J.; Fang, Zongtang; Wang, Tsang-Hsiu; Dixon, David A.

    2016-06-01

    Silicon oxide nanostructures which span the range from hydrophilic to hydrophobic have been synthesized. The surface chemistry of these silicon-based nanostructures was analyzed using a combination of X-ray photoelectron spectroscopy, reflectance infrared spectroscopy, scanning electron microscopy, and thermogravimetric analysis. The dominant oxidation state for the nanostructured oxides shifts from an average oxidation state of +III to a combination of +II and +III oxidation states. A correlation of the ability to adsorb water with variations in the surface Si:O ratios was observed showing a transition from hydrophilic to hydrophobic character.

  17. The interface between silicon and a high-k oxide.

    PubMed

    Först, Clemens J; Ashman, Christopher R; Schwarz, Karlheinz; Blöchl, Peter E

    2004-01-01

    The ability of the semiconductor industry to continue scaling microelectronic devices to ever smaller dimensions (a trend known as Moore's Law) is limited by quantum mechanical effects: as the thickness of conventional silicon dioxide (SiO(2)) gate insulators is reduced to just a few atomic layers, electrons can tunnel directly through the films. Continued device scaling will therefore probably require the replacement of the insulator with high-dielectric-constant (high-k) oxides, to increase its thickness, thus preventing tunnelling currents while retaining the electronic properties of an ultrathin SiO(2) film. Ultimately, such insulators will require an atomically defined interface with silicon without an interfacial SiO(2) layer for optimal performance. Following the first reports of epitaxial growth of AO and ABO(3) compounds on silicon, the formation of an atomically abrupt crystalline interface between strontium titanate and silicon was demonstrated. However, the atomic structure proposed for this interface is questionable because it requires silicon atoms that have coordinations rarely found elsewhere in nature. Here we describe first-principles calculations of the formation of the interface between silicon and strontium titanate and its atomic structure. Our study shows that atomic control of the interfacial structure by altering the chemical environment can dramatically improve the electronic properties of the interface to meet technological requirements. The interface structure and its chemistry may provide guidance for the selection process of other high-k gate oxides and for controlling their growth.

  18. The study of optical band edge property of bismuth oxide nanowires α-Bi2O3.

    PubMed

    Ho, Ching-Hwa; Chan, Ching-Hsiang; Huang, Ying-Sheng; Tien, Li-Chia; Chao, Liang-Chiun

    2013-05-20

    The α-phase Bi(2)O(3) (α-Bi(2)O(3)) is a crucial and potential visiblelight photocatalyst material needless of intentional doping on accommodating band gap. The understanding on fundamental optical property of α-Bi(2)O(3) is important for its extended applications. In this study, bismuth oxide nanowires with diameters from tens to hundreds nm have been grown by vapor transport method driven with vapor-liquid-solid mechanism on Si substrate. High-resolution transmission electron microscopy and Raman measurement confirm α phase of monoclinic structure for the as-grown nanowires. The axial direction for the as-grown nanowires was along < 122 >. The band-edge structure of α-Bi(2)O(3) has been probed experimentally by thermoreflectance (TR) spectroscopy. The direct band gap was determined accurately to be 2.91 eV at 300 K. Temperaturedependent TR measurements of 30-300 K were carried out to evaluate temperature-energy shift and line-width broadening effect for the band edge of α-Bi(2)O(3) thin-film nanowires. Photoluminescence (PL) experiments at 30 and 300 K were carried out to identify band-edge emission as well as defect luminescence for the α-Bi(2)O(3) nanowires. On the basis of experimental analyses of TR and PL, optical characteristics of direct band edge of α-Bi(2)O(3) nanowires have thus been realized.

  19. The Oxidation of CVD Silicon Carbide in Carbon Dioxide

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.; Nguyen, QuynchGiao N.

    1997-01-01

    Chemically-vapor-deposited silicon carbide (CVD SiC) was oxidized in carbon dioxide (CO2) at temperatures of 1200-1400 C for times between 100 and 500 hours at several gas flow rates. Oxidation weight gains were monitored by thermogravimetric analysis (TGA) and were found to be very small and independent of temperature. Possible rate limiting kinetic laws are discussed. Oxidation of SiC by CO2 is negligible compared to the rates measured for other oxidants typically found in combustion environments: oxygen and water vapor.

  20. Tribological interaction between polytetrafluoroethylene and silicon oxide surfaces

    SciTech Connect

    Uçar, A.; Çopuroğlu, M.; Suzer, S.; Baykara, M. Z.; Arıkan, O.

    2014-10-28

    We investigated the tribological interaction between polytetrafluoroethylene (PTFE) and silicon oxide surfaces. A simple rig was designed to bring about a friction between the surfaces via sliding a piece of PTFE on a thermally oxidized silicon wafer specimen. A very mild inclination (∼0.5°) along the sliding motion was also employed in order to monitor the tribological interaction in a gradual manner as a function of increasing contact force. Additionally, some patterns were sketched on the silicon oxide surface using the PTFE tip to investigate changes produced in the hydrophobicity of the surface, where the approximate water contact angle was 45° before the transfer. The nature of the transferred materials was characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). XPS results revealed that PTFE was faithfully transferred onto the silicon oxide surface upon even at the slightest contact and SEM images demonstrated that stable morphological changes could be imparted onto the surface. The minimum apparent contact pressure to realize the PTFE transfer is estimated as 5 kPa, much lower than reported previously. Stability of the patterns imparted towards many chemical washing processes lead us to postulate that the interaction is most likely to be chemical. Contact angle measurements, which were carried out to characterize and monitor the hydrophobicity of the silicon oxide surface, showed that upon PTFE transfer the hydrophobicity of the SiO{sub 2} surface could be significantly enhanced, which might also depend upon the pattern sketched onto the surface. Contact angle values above 100° were obtained.

  1. Electron stimulated oxidation of silicon surfaces

    SciTech Connect

    Munoz, M.C.; Sacedon, J.L.

    1981-04-15

    Experimental evidence of electron stimulated oxidation (ESO) has been given for Si(111) 7 x 7 surface. In a first stage, the oxide thickness as a function of time shows a linear relationship; in a second stage, the growth rate quickly decreases and a pressure dependent saturation oxide thickness is reached. During the oxidation process an electrical potential does exist across the oxide, as is required in the Cabrera--Mott theory. The linear kinetics and the electrical potential are shown to be explicable in terms of a modified coupled-current approach based on the Cabrera--Mott theory, provided a semiphenomenological pressure dependent parameter is included. This represents a contribution of the surface reaction to the transport equation. The saturation has been explained as due to the decrease of the negative surface charge (donor levels) which produces a decrease of the electron current.

  2. Single layer of silicon quantum dots in silicon oxide matrix: Investigation of forming gas hydrogenation on photoluminescence properties and study of the composition of silicon rich oxide layers

    NASA Astrophysics Data System (ADS)

    Aliberti, P.; Shrestha, S. K.; Li, Ruoyu; Green, M. A.; Conibeer, G. J.

    2011-07-01

    Structures consisting of a single layer of silicon quantum dots in a SiO 2 matrix show interesting optoelectronic properties and potential use as energy selective filters, which are a crucial component for the realization of the hot carrier solar cell. In this work single layer silicon quantum dots in SiO 2 have been realized using a magnetron sputtering technique. Quantum dots are formed by annealing of a silicon rich oxide layer deposited between a thermally grown SiO 2 layer and a sputtered SiO 2 layer. The effects of a forming gas post-hydrogenation process on the photoluminescence of the single layer of quantum dots have been investigated in order to understand the photoluminescence mechanism. It was found that for sputtered silicon quantum dots in SiO 2 matrix the photoemission mechanisms are primarily due to quantum confinement and does not strongly rely on matrix defects. In addition, physical and optical properties of several thick silicon rich oxide layers, with different chemical compositions, have been investigated in order to optimize the stoichiometry of silicon rich oxide in the single layers.

  3. New insights into the effects of silicon content on the oxidation process in silicon-containing steels

    NASA Astrophysics Data System (ADS)

    Yuan, Qing; Xu, Guang; Zhou, Ming-xing; He, Bei

    2016-09-01

    Simultaneous thermal analysis (STA) was used to investigate the effects of silicon content on the oxidation kinetics of silicon- containing steels under an atmosphere and heating procedures similar to those used in industrial reheating furnaces for the production of hot-rolled strips. Our results show that when the heating temperature was greater than the melting point of Fe2SiO4, the oxidation rates of steels with different silicon contents were the same; the total mass gain decreased with increasing silicon content, whereas it increased with increasing oxygen content. The oxidation rates for steels with different silicon contents were constant with respect to time under isothermal conditions. In addition, the starting oxidation temperature, the intense oxidation temperature, and the finishing oxidation temperature increased with increasing silicon content; the intense oxidation temperature had no correlation with the melting of Fe2SiO4. Moreover, the silicon distributed in two forms: as Fe2SiO4 at the interface between the innermost layer of oxide scale and the iron matrix, and as particles containing silicon in grains and grain boundaries in the iron matrix.

  4. Silicon nanowire circuits fabricated by AFM oxidation nanolithography.

    PubMed

    Martínez, Ramses V; Martínez, Javier; Garcia, Ricardo

    2010-06-18

    We report a top-down process for the fabrication of single-crystalline silicon nanowire circuits and devices. Local oxidation nanolithography is applied to define very narrow oxide masks on top of a silicon-on-insulator substrate. In a plasma etching, the nano-oxide mask generates a nanowire with a rectangular section. The nanowire width coincides with the lateral size of the mask. In this way, uniform and well-defined transistors with channel widths in the 10-20 nm range have been fabricated. The nanowires can be positioned with sub-100 nm lateral accuracy. The transistors exhibit an on/off current ratio of 10(5). The atomic force microscope nanolithography offers full control of the nanowire's shape from straight to circular or a combination of them. It also enables the integration of several nanowires within the same circuit. The nanowire transistors have been applied to detect immunological processes.

  5. Origin of complex impact craters on native oxide coated silicon surfaces

    NASA Astrophysics Data System (ADS)

    Samela, Juha; Nordlund, Kai; Popok, Vladimir N.; Campbell, Eleanor E. B.

    2008-02-01

    Crater structures induced by impact of keV-energy Arn+ cluster ions on silicon surfaces are measured with atomic force microscopy. Complex crater structures consisting of a central hillock and outer rim are observed more often on targets covered with a native silicon oxide layer than on targets without the oxide layer. To explain the formation of these complex crater structures, classical molecular dynamics simulations of Ar cluster impacts on oxide coated silicon surfaces, as well as on bulk amorphous silica, amorphous Si, and crystalline Si substrates, are carried out. The diameter of the simulated hillock structures in the silicon oxide layer is in agreement with the experimental results, but the simulations cannot directly explain the height of hillocks and the outer rim structures when the oxide coated silicon substrate is free of defects. However, in simulations of 5keV /atom Ar12 cluster impacts, transient displacements of the amorphous silicon or silicon oxide substrate surfaces are induced in an approximately 50nm wide area surrounding the impact point. In silicon oxide, the transient displacements induce small topographical changes on the surface in the vicinity of the central hillock. The comparison of cluster stopping mechanisms in the various silicon oxide and silicon structures shows that the largest lateral momentum is induced in the silicon oxide layer during the impact; thus, the transient displacements on the surface are stronger than in the other substrates. This can be a reason for the higher frequency of occurrence of the complex craters on oxide coated silicon.

  6. Oxidation Protection of Porous Reaction-Bonded Silicon Nitride

    NASA Technical Reports Server (NTRS)

    Fox, D. S.

    1994-01-01

    Oxidation kinetics of both as-fabricated and coated reaction-bonded silicon nitride (RBSN) were studied at 900 and 1000 C with thermogravimetry. Uncoated RBSN exhibited internal oxidation and parabolic kinetics. An amorphous Si-C-O coating provided the greatest degree of protection to oxygen, with a small linear weight loss observed. Linear weight gains were measured on samples with an amorphous Si-N-C coating. Chemically vapor deposited (CVD) Si3N4 coated RBSN exhibited parabolic kinetics, and the coating cracked severely. A continuous-SiC-fiber-reinforced RBSN composite was also coated with the Si-C-O material, but no substantial oxidation protection was observed.

  7. Efficient Direct Reduction of Graphene Oxide by Silicon Substrate

    PubMed Central

    Chan Lee, Su; Some, Surajit; Wook Kim, Sung; Jun Kim, Sun; Seo, Jungmok; Lee, Jooho; Lee, Taeyoon; Ahn, Jong-Hyun; Choi, Heon-Jin; Chan Jun, Seong

    2015-01-01

    Graphene has been studied for various applications due to its excellent properties. Graphene film fabrication from solutions of graphene oxide (GO) have attracted considerable attention because these procedures are suitable for mass production. GO, however, is an insulator, and therefore a reduction process is required to make the GO film conductive. These reduction procedures require chemical reducing agents or high temperature annealing. Herein, we report a novel direct and simple reduction procedure of GO by silicon, which is the most widely used material in the electronics industry. In this study, we also used silicon nanosheets (SiNSs) as reducing agents for GO. The reducing effect of silicon was confirmed by various characterization methods. Furthermore, the silicon wafer was also used as a reducing template to create a reduced GO (rGO) film on a silicon substrate. By this process, a pure rGO film can be formed without the impurities that normally come from chemical reducing agents. This is an easy and environmentally friendly method to prepare large scale graphene films on Si substrates. PMID:26194107

  8. Synthesis and oxidation of luminescent silicon nanocrystals from silicon tetrachloride by very high frequency nonthermal plasma

    NASA Astrophysics Data System (ADS)

    Gresback, Ryan; Nozaki, Tomohiro; Okazaki, Ken

    2011-07-01

    Silicon nanocrystals have recently attracted significant attention for applications in electronics, optoelectronics, and biological imaging due to their size-dependent optical and electronic properties. Here a method for synthesizing luminescent silicon nanocrystals from silicon tetrachloride with a nonthermal plasma is described. Silicon nanocrystals with mean diameters of 3-15 nm are synthesized and have a narrow size distribution with the standard deviation being less than 20% of the mean size. Control over crystallinity is achieved for plasma pressures of 1-12 Torr and hydrogen gas concentrations of 5-70% through adjustment of the plasma power. The size of nanocrystals, and resulting optical properties, is mainly dependent on the gas residence time in the plasma region. Additionally the surface of the nanocrystals is covered by both hydrogen and chlorine. Oxidation of the nanocrystals, which is found to follow the Cabrera-Mott mechanism under ambient conditions, is significantly faster than hydrogen terminated silicon due to partial termination of the nanocrystal surface by chlorine.

  9. Green light emission from terbium doped silicon rich silicon oxide films obtained by plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Podhorodecki, A.; Zatryb, G.; Misiewicz, J.; Wojcik, J.; Wilson, P. R. J.; Mascher, P.

    2012-11-01

    The effect of silicon concentration and annealing temperature on terbium luminescence was investigated for thin silicon rich silicon oxide films. The structures were deposited by means of plasma enhanced chemical vapor deposition. The structural properties of these films were investigated by Rutherford backscattering spectrometry, transmission electron microscopy and Raman scattering. The optical properties were investigated by means of photoluminescence and photoluminescence decay spectroscopy. It was found that both the silicon concentration in the film and the annealing temperature have a strong impact on the terbium emission intensity. In this paper, we present a detailed discussion of these issues and determine the optimal silicon concentration and annealing temperature.

  10. Microstructure of Rapidly Quenched Bismuth Iron Oxide Systems with Ferromagnetic Character

    NASA Astrophysics Data System (ADS)

    Tanaka, Katsuhisa; Hirao, Kazuyuki; Soga, Naohiro; Mori, Hirotaro

    1991-12-01

    Mössbauer measurements and high-resolution electron microscopy have been carried out on rapidly quenched 10CaO\\cdot30Bi2O3·60Fe2O3 and Bi3Fe5O12 which exhibit ferromagnetic character at room temperature. The intensity of the peaks due to internal fields in Mössbauer spectra are very weak at room temperature and increases with a decrease of temperature, indicating that the specimens are superparamagnetic. The electron micrograph clearly shows that the specimens contain microcrystals of 5 to 10 nm. The ferromagnetic character of the present oxides is brought about by the ferrimagnetic microcrystals precipitated.

  11. Biocompatible silicon surfaces through orthogonal click chemistries and a high affinity silicon oxide binding peptide.

    PubMed

    Hassert, Rayk; Pagel, Mareen; Ming, Zhou; Häupl, Tilmann; Abel, Bernd; Braun, Klaus; Wiessler, Manfred; Beck-Sickinger, Annette G

    2012-10-17

    Multifunctionality is gaining more and more importance in the field of improved biomaterials. Especially peptides feature a broad chemical variability and are versatile mediators between inorganic surfaces and living cells. Here, we synthesized a unique peptide that binds to SiO(2) with nM affinity. We equipped the peptide with the bioactive integrin binding c[RGDfK]-ligand and a fluorescent probe by stepwise Diels-Alder reaction with inverse electron demand and copper(I) catalyzed azide-alkyne cycloaddition. For the first time, we report the generation of a multifunctional peptide by combining these innovative coupling reactions. The resulting peptide displayed an outstanding binding to silicon oxide and induced a significant increase in cell spreading and cell viability of osteoblasts on the oxidized silicon surface.

  12. Interfacial Structure in Silicon Nitride Sintered with Lanthanide Oxide

    SciTech Connect

    Dwyer, C.; Ziegler, A.; Shibata, Naoya; Winkelman, G. B.; Satet, R. L.; Hoffmann, M. J.; Cinibulk, M. K.; Becher, Paul F; Painter, Gayle S; Browning, N. D.; Cockayne, D.J.H.; Ritchie, R O; Pennycook, Stephen J

    2006-01-01

    Three independent research groups present a comparison of their structural analyses of prismatic interfaces in silicon nitride densified with the aid of lanthanide oxide Ln{sub 2}O{sub 3}. All three groups obtained scanning transmission electron microscope images which clearly reveal the presence of well-defined Ln segregation sites at the interfaces, and, moreover, reveal that these segregation sites are element-specific. While some results differ across the three research groups, the vast majority exhibits good reproducibility.

  13. Engineering functionalized multi-phased silicon/silicon oxide nano-biomaterials to passivate the aggressive proliferation of cancer.

    PubMed

    Premnath, P; Tan, B; Venkatakrishnan, K

    2015-07-20

    Currently, the use of nano silicon in cancer therapy is limited as drug delivery vehicles and markers in imaging, not as manipulative/controlling agents. This is due to limited properties that native states of nano silicon and silicon oxides offers. We introduce nano-functionalized multi-phased silicon/silicon oxide biomaterials synthesized via ultrashort pulsed laser synthesis, with tunable properties that possess inherent cancer controlling properties that can passivate the progression of cancer. This nanostructured biomaterial is composed of individual functionalized nanoparticles made of a homogenous hybrid of multiple phases of silicon and silicon oxide in increasing concentration outwards from the core. The chemical properties of the proposed nanostructure such as number of phases, composition of phases and crystal orientation of each functionalized nanoparticle in the three dimensional nanostructure is defined based on precisely tuned ultrashort pulsed laser-material interaction mechanisms. The amorphous rich phased biomaterial shows a 30 fold (95%) reduction in number of cancer cells compared to bulk silicon in 48 hours. Further, the size of the cancer cells reduces by 76% from 24 to 48 hours. This method exposes untapped properties of combination of multiple phases of silicon oxides and its applications in cancer therapy.

  14. Engineering functionalized multi-phased silicon/silicon oxide nano-biomaterials to passivate the aggressive proliferation of cancer

    PubMed Central

    Premnath, P.; Tan, B.; Venkatakrishnan, K.

    2015-01-01

    Currently, the use of nano silicon in cancer therapy is limited as drug delivery vehicles and markers in imaging, not as manipulative/controlling agents. This is due to limited properties that native states of nano silicon and silicon oxides offers. We introduce nano-functionalized multi-phased silicon/silicon oxide biomaterials synthesized via ultrashort pulsed laser synthesis, with tunable properties that possess inherent cancer controlling properties that can passivate the progression of cancer. This nanostructured biomaterial is composed of individual functionalized nanoparticles made of a homogenous hybrid of multiple phases of silicon and silicon oxide in increasing concentration outwards from the core. The chemical properties of the proposed nanostructure such as number of phases, composition of phases and crystal orientation of each functionalized nanoparticle in the three dimensional nanostructure is defined based on precisely tuned ultrashort pulsed laser-material interaction mechanisms. The amorphous rich phased biomaterial shows a 30 fold (95%) reduction in number of cancer cells compared to bulk silicon in 48 hours. Further, the size of the cancer cells reduces by 76% from 24 to 48 hours. This method exposes untapped properties of combination of multiple phases of silicon oxides and its applications in cancer therapy. PMID:26190009

  15. Engineering functionalized multi-phased silicon/silicon oxide nano-biomaterials to passivate the aggressive proliferation of cancer

    NASA Astrophysics Data System (ADS)

    Premnath, P.; Tan, B.; Venkatakrishnan, K.

    2015-07-01

    Currently, the use of nano silicon in cancer therapy is limited as drug delivery vehicles and markers in imaging, not as manipulative/controlling agents. This is due to limited properties that native states of nano silicon and silicon oxides offers. We introduce nano-functionalized multi-phased silicon/silicon oxide biomaterials synthesized via ultrashort pulsed laser synthesis, with tunable properties that possess inherent cancer controlling properties that can passivate the progression of cancer. This nanostructured biomaterial is composed of individual functionalized nanoparticles made of a homogenous hybrid of multiple phases of silicon and silicon oxide in increasing concentration outwards from the core. The chemical properties of the proposed nanostructure such as number of phases, composition of phases and crystal orientation of each functionalized nanoparticle in the three dimensional nanostructure is defined based on precisely tuned ultrashort pulsed laser-material interaction mechanisms. The amorphous rich phased biomaterial shows a 30 fold (95%) reduction in number of cancer cells compared to bulk silicon in 48 hours. Further, the size of the cancer cells reduces by 76% from 24 to 48 hours. This method exposes untapped properties of combination of multiple phases of silicon oxides and its applications in cancer therapy.

  16. Engineering functionalized multi-phased silicon/silicon oxide nano-biomaterials to passivate the aggressive proliferation of cancer.

    PubMed

    Premnath, P; Tan, B; Venkatakrishnan, K

    2015-01-01

    Currently, the use of nano silicon in cancer therapy is limited as drug delivery vehicles and markers in imaging, not as manipulative/controlling agents. This is due to limited properties that native states of nano silicon and silicon oxides offers. We introduce nano-functionalized multi-phased silicon/silicon oxide biomaterials synthesized via ultrashort pulsed laser synthesis, with tunable properties that possess inherent cancer controlling properties that can passivate the progression of cancer. This nanostructured biomaterial is composed of individual functionalized nanoparticles made of a homogenous hybrid of multiple phases of silicon and silicon oxide in increasing concentration outwards from the core. The chemical properties of the proposed nanostructure such as number of phases, composition of phases and crystal orientation of each functionalized nanoparticle in the three dimensional nanostructure is defined based on precisely tuned ultrashort pulsed laser-material interaction mechanisms. The amorphous rich phased biomaterial shows a 30 fold (95%) reduction in number of cancer cells compared to bulk silicon in 48 hours. Further, the size of the cancer cells reduces by 76% from 24 to 48 hours. This method exposes untapped properties of combination of multiple phases of silicon oxides and its applications in cancer therapy. PMID:26190009

  17. Nonlinear optical properties of zinc oxide doped bismuth thin films using Z-scan technique

    NASA Astrophysics Data System (ADS)

    Abed, S.; Bouchouit, K.; Aida, M. S.; Taboukhat, S.; Sofiani, Z.; Kulyk, B.; Figa, V.

    2016-06-01

    ZnO doped Bi thin films were grown on glass substrates by spray ultrasonic technique. This paper presents the effect of Bi doping concentration on structural and nonlinear optical properties of zinc oxide thin films. These thin films were characterized by X-ray diffractometer technique. XRD analysis revealed that the ZnO:Bi thin films indicated good preferential orientation along c-axis perpendicular to the substrate. The nonlinear optical properties such as nonlinear absorption coefficient (β) and third order nonlinear susceptibility (Imχ(3)) are investigated. The calculations have been performed with a Z scan technique using Nd:YAG laser emitting 532 nm. The reverse saturable absorption (RSA) mechanism was responsible for the optical limiting effect. The results suggest that this material considered as a promising candidate for future optical device applications.

  18. Physical and electrical properties of copper oxide doped bismuth borate glasses

    NASA Astrophysics Data System (ADS)

    Dhiman, R. L.; Kundu, Virender Singh; Arora, Susheel; Maan, A. S.

    2013-06-01

    The role of CuO on the physical and electrical properties in x CuO.(25-x)Bi2O3.75B2O3;(5≤x≤20) glass system has been investigated. The glasses were prepared by normal melt quench technique. The density and molar volume of the glasses decreases with increase in CuO (mol %). The dc conductivity was measured in the temperature range 413-513 K. The conduction mechanism in these glasses was discussed in terms of small polaron hopping (SPH) theory proposed by Mott. The activation energy is found to decrease with increasing copper oxide content. The dc conductivity increases with increase in CuO content and ranging from 6.02×10-12 (Ωm)-1 to 1.096×10-10 (Ωm)-1 at 450K.

  19. Method for removing oxide contamination from silicon carbide powders

    DOEpatents

    Brynestad, J.; Bamberger, C.E.

    1984-08-01

    The described invention is directed to a method for removing oxide contamination in the form of oxygen-containing compounds such as SiO/sub 2/ and B/sub 2/O/sub 3/ from a charge of finely divided silicon carbide. The silicon carbide charge is contacted with a stream of hydrogen fluoride mixed with an inert gas carrier such as argon at a temperature in the range of about 200/sup 0/ to 650/sup 0/C. The oxides in the charge react with the heated hydrogen fluoride to form volatile gaseous fluorides such as SiF/sub 4/ and BF/sub 3/ which pass through the charge along with unreacted hydrogen fluoride and the carrier gas. Any residual gaseous reaction products and hydrogen fluoride remaining in the charge are removed by contacting the charge with the stream of inert gas which also cools the powder to room temperature. The removal of the oxygen contamination by practicing the present method provides silicon carbide powders with desirable pressing and sintering characteristics. 1 tab.

  20. Low reflectance sputtered vanadium oxide thin films on silicon

    NASA Astrophysics Data System (ADS)

    Esther, A. Carmel Mary; Dey, Arjun; Rangappa, Dinesh; Sharma, Anand Kumar

    2016-07-01

    Vanadium oxide thin films on silicon (Si) substrate are grown by pulsed radio frequency (RF) magnetron sputtering technique at RF power in the range of 100-700 W at room temperature. Deposited thin films are characterized by field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) techniques to investigate microstructural, phase, electronic structure and oxide state characteristics. The reflectance and transmittance spectra of the films and the Si substrate are recorded at the solar region (200-2300 nm) of the spectral window. Substantial reduction in reflectance and increase in transmittance is observed for the films grown beyond 200 W. Further, optical constants viz. absorption coefficient, refractive index and extinction coefficient of the deposited vanadium oxide films are evaluated.

  1. Effect of hydrogen passivation on the photoluminescence of Tb ions in silicon rich silicon oxide films

    NASA Astrophysics Data System (ADS)

    Zatryb, G.; Klak, M. M.; Wojcik, J.; Misiewicz, J.; Mascher, P.; Podhorodecki, A.

    2015-12-01

    In this work, silicon-rich silicon oxide films containing terbium were prepared by means of plasma enhanced chemical vapor deposition. The influence of hydrogen passivation on defects-mediated non-radiative recombination of excited Tb3+ ions was investigated by photoluminescence, photoluminescence excitation, and photoluminescence decay measurements. Passivation was found to have no effect on shape and spectral position of the excitation spectra. In contrast, a gradual increase in photoluminescence intensity and photoluminescence decay time was observed upon passivation for the main 5D4-7F5 transition of Tb3+ ions. This observation was attributed to passivation of non-radiative recombination defects centers with hydrogen. It was found that the number of emitted photons increases upon passivation as a result of two effects: (1) longer Tb3+ lifetime in the 5D4 excited state and (2) optical activation of new Tb3+ emitters. The obtained results were discussed and compared with other experimental reports.

  2. Process to produce silicon carbide fibers using a controlled concentration of boron oxide vapor

    NASA Technical Reports Server (NTRS)

    Barnard, Thomas Duncan (Inventor); Lipowitz, Jonathan (Inventor); Nguyen, Kimmai Thi (Inventor)

    2000-01-01

    A process for producing polycrystalline silicon carbide includes heating an amorphous ceramic fiber that contains silicon and carbon in an environment containing boron oxide vapor. The boron oxide vapor is produced in situ by the reaction of a boron containing material such as boron carbide and an oxidizing agent such as carbon dioxide, and the amount of boron oxide vapor can be controlled by varying the amount and rate of addition of the oxidizing agent.

  3. Process to produce silicon carbide fibers using a controlled concentration of boron oxide vapor

    NASA Technical Reports Server (NTRS)

    Barnard, Thomas Duncan (Inventor); Lipowitz, Jonathan (Inventor); Nguyen, Kimmai Thi (Inventor)

    2001-01-01

    A process for producing polycrystalline silicon carbide by heating an amorphous ceramic fiber that contains silicon and carbon in an environment containing boron oxide vapor. The boron oxide vapor is produced in situ by the reaction of a boron containing material such as boron carbide and an oxidizing agent such as carbon dioxide, and the amount of boron oxide vapor can be controlled by varying the amount and rate of addition of the oxidizing agent.

  4. Oxidation Behavior of Carbon Fiber Reinforced Silicon Carbide Composites

    NASA Technical Reports Server (NTRS)

    Valentin, Victor M.

    1995-01-01

    Carbon fiber reinforced Silicon Carbide (C-SiC) composites offer high strength at high temperatures and good oxidation resistance. However, these composites present some matrix microcracks which allow the path of oxygen to the fiber. The aim of this research was to study the effectiveness of a new Silicon Carbide (SiC) coating developed by DUPONT-LANXIDE to enhance the oxidation resistance of C-SiC composites. A thermogravimetric analysis was used to determine the oxidation rate of the samples at different temperatures and pressures. The Dupont coat proved to be a good protection for the SiC matrix at temperatures lower than 1240 C at low and high pressures. On the other hand, at temperatures above 1340 C the Dupont coat did not seem to give good protection to the composite fiber and matrix. Even though some results of the tests have been discussed, because of time restraints, only a small portion of the desired tests could be completed. Therefore, no major conclusions or results about the effectiveness of the coat are available at this time.

  5. Origin of complex impact craters on native oxide coated silicon surfaces

    SciTech Connect

    Samela, Juha; Nordlund, Kai; Popok, Vladimir N.; Campbell, Eleanor E. B.

    2008-02-15

    Crater structures induced by impact of keV-energy Ar{sub n}{sup +} cluster ions on silicon surfaces are measured with atomic force microscopy. Complex crater structures consisting of a central hillock and outer rim are observed more often on targets covered with a native silicon oxide layer than on targets without the oxide layer. To explain the formation of these complex crater structures, classical molecular dynamics simulations of Ar cluster impacts on oxide coated silicon surfaces, as well as on bulk amorphous silica, amorphous Si, and crystalline Si substrates, are carried out. The diameter of the simulated hillock structures in the silicon oxide layer is in agreement with the experimental results, but the simulations cannot directly explain the height of hillocks and the outer rim structures when the oxide coated silicon substrate is free of defects. However, in simulations of 5 keV/atom Ar{sub 12} cluster impacts, transient displacements of the amorphous silicon or silicon oxide substrate surfaces are induced in an approximately 50 nm wide area surrounding the impact point. In silicon oxide, the transient displacements induce small topographical changes on the surface in the vicinity of the central hillock. The comparison of cluster stopping mechanisms in the various silicon oxide and silicon structures shows that the largest lateral momentum is induced in the silicon oxide layer during the impact; thus, the transient displacements on the surface are stronger than in the other substrates. This can be a reason for the higher frequency of occurrence of the complex craters on oxide coated silicon.

  6. Enhanced room temperature oxidation in silicon and porous silicon under 10 keV x-ray irradiation

    SciTech Connect

    Ryckman, Judson D.; Reed, Robert A.; Weller, Robert A.; Fleetwood, D. M.; Weiss, S. M.

    2010-12-01

    We report the observation of enhanced oxidation on silicon and porous silicon samples exposed in air ambient to high-dose-rate 10 keV x-ray radiation at room temperature. The evolution of the radiation-induced oxide growth is monitored by ellipsometry and interferometric reflectance spectroscopy. Fourier transform infrared (FTIR) spectroscopy shows the emergence of Si-O-Si stretching modes and corresponding suppression of SiH{sub x} and Si-Si modes in the porous silicon samples. The radiation response depends strongly on initial native oxide thickness and Si-H surface species. The enhanced oxidation mechanism is attributed to photoinduced oxidation processes wherein energetic photons are used to dissociate molecular oxygen and promote the formation of more reactive oxygen species.

  7. Effect of phase stability degradation of bismuth on sensor characteristics of nano-bismuth fixed electrode.

    PubMed

    Lee, Gyoung-Ja; Kim, Chang Kyu; Lee, Min Ku; Rhee, Chang Kyu

    2010-12-15

    Effect of phase stability degradation of bismuth on sensor characteristics of nano-bismuth fixed electrode has been investigated using square-wave anodic stripping voltammetry technique, scanning electron microscopy (SEM) and X-ray diffraction (XRD) spectroscopy. From the analyses of square-wave anodic stripping voltammograms (SWASV) repetitively measured on the nano-bismuth fixed electrode, it was found that the oxidation peak currents dropped by 81%, 68% and 59% for zinc, cadmium and lead, respectively, after the 100th measurement (about 400 min of operation time). The sphere bismuth nanoparticles gradually changed to the agglomerates with petal shape as the operation time increased. From the analyses of SEM images and XRD patterns, it is confirmed that the oxidation of Bi into BiOCl/Bi(2)O(2)CO(3) and the agglomeration of bismuth nanoparticles caused by the phase change decrease a reproducibility of the stripping voltammetric response. Moreover, most of the bismuth becomes BiOCl at pH 3.0 and bismuth hydroxide, Bi(OH)(3) at pH 7.0, which results in a significant decrease in sensitivity of the nano-bismuth fixed electrode.

  8. Effect of Graphene Oxide on the Properties of Porous Silicon

    NASA Astrophysics Data System (ADS)

    Olenych, Igor B.; Aksimentyeva, Olena I.; Monastyrskii, Liubomyr S.; Horbenko, Yulia Yu.; Partyka, Maryan V.; Luchechko, Andriy P.; Yarytska, Lidia I.

    2016-02-01

    We studied an effect of the graphene oxide (GO) layer on the optical and electrical properties of porous silicon (PS) in hybrid PS-GO structure created by electrochemical etching of silicon wafer and deposition of GO from water dispersion on PS. With the help of scanning electron microscopy (SEM), atomic-force microscopy (AFM), and Fourier transform infrared (FTIR) spectroscopy, it was established that GO formed a thin film on the PS surface and is partly embedded in the pores of PS. A comparative analysis of the FTIR spectra for the PS and PS-GO structures confirms the passivation of the PS surface by the GO film. This film has a sufficient transparency for excitation and emission of photoluminescence (PL). Moreover, GO modifies PL spectrum of PS, shifting the PL maximum by 25 nm towards lower energies. GO deposition on the surface of the porous silicon leads to the change in the electrical parameters of PS in AC and DC modes. By means of current-voltage characteristics (CVC) and impedance spectroscopy, it is shown that the impact of GO on electrical characteristics of PS manifests in reduced capacitance and lower internal resistance of hybrid structures.

  9. Oxidation of silicon and germanium by atomic and molecular oxygen

    NASA Astrophysics Data System (ADS)

    Kisa, Maja

    2007-12-01

    Space vehicles residing in the low Earth orbit (LEO) are exposed to a harsh environment that rapidly degrades their materials. The LEO ranges from 200-700km in altitude from the Earth's surface, and the temperature varies between 200 and 400K. The most hazardous species in LEO is atomic oxygen (AO) containing 5eV kinetic energy due to the high velocity of the spacecrafts (8km/s). The goal of this research is the elucidation of the fundamental mechanisms of semiconductor degradation and passivation in LEO conditions by comparing the structural differences in the oxide films created by exposure to AO and molecular oxygen (MO). Silicon is the base material for solar cells used in LEO whereas Ge and SiOx films are common coatings to protect polymer materials that are used as structural materials in spacecrafts. Hyperthermal AO was created by the laser detonation of MO within a high vacuum (HV) chamber, that produces a high flux of AO. A variety of nano-characterization techniques, including high resolution transmission electron microscopy (HREM), and electron energy loss spectroscopy (EELS) were used to determine the microstructure and local chemistry of the oxide and the oxide/semiconductor interface. For Si, the amorphous silica formed by AO was nearly twice as thick, more ordered, and more homogeneous in composition, than the oxide formed by MO. The Si/SiOx interface formed by AO was atomically abrupt, with no suboxides detected near the interface or throughout the oxide. The oxide scale formed by MO on Si(100) consisted of transitional oxidation states. The oxide film formed on Ge(100) due to exposure to 5eV AO, is 2-3 times thicker and similarly to the Si/SiOx interfaces, the Ge/GeOx interface was found to be atomically abrupt. The oxidation kinetics of Si and Ge were monitored in situ using a research quartz crystal microbalance (RQCM) that was incorporated into the AO source. The oxidation kinetics in hyperthermal AO did not follow the standard linear to

  10. Study of the processes of carbonization and oxidation of porous silicon by Raman and IR spectroscopy

    SciTech Connect

    Vasin, A. V.; Okholin, P. N.; Verovsky, I. N.; Nazarov, A. N.; Lysenko, V. S.; Kholostov, K. I. Bondarenko, V. P.; Ishikawa, Y.

    2011-03-15

    Porous silicon layers were produced by electrochemical etching of single-crystal silicon wafers with the resistivity 10 {Omega} cm in the aqueous-alcohol solution of hydrofluoric acid. Raman spectroscopy and infrared absorption spectroscopy are used to study the processes of interaction of porous silicon with undiluted acetylene at low temperatures and the processes of oxidation of carbonized porous silicon by water vapors. It is established that, even at the temperature 550 Degree-Sign C, the silicon-carbon bonds are formed at the pore surface and the graphite-like carbon condensate emerges. It is shown that the carbon condensate inhibits oxidation of porous silicon by water vapors and contributes to quenching of white photoluminescence in the oxidized carbonized porous silicon nanocomposite layer.

  11. Thermoelectric properties of pressed bismuth nanoparticles

    NASA Astrophysics Data System (ADS)

    Hostler, Stephen R.; Qu, Yu Qiao; Demko, Michael T.; Abramson, Alexis R.; Qiu, Xiaofeng; Burda, Clemens

    2008-03-01

    Theory predicts a substantial increase in the dimensionless figure of merit as the dimensionality and characteristic size of a material are decreased. We explore the use of bismuth nanoparticles pressed into pellets as potential increased efficiency thermoelectric materials. The figure of merit of these pellets is determined by independently measuring the electrical conductivity, thermal conductivity and Seebeck coefficient. The results from the nanoparticle sample are compared to microparticle-based samples. Both sample types show a slight reduction in thermal conductivity relative to bulk bismuth and a Seebeck coefficient near or slightly larger in magnitude than bulk bismuth. These changes are dwarfed by a hundred-fold decrease in the electrical conductivity due to porosity and an oxide layer on the particles. The low conductivity leads to figures of merit at least two orders of magnitude smaller than bulk bismuth. Oxide layer removal and reduced pellet porosity will be required to increase the figure of merit.

  12. Silicon and tungsten oxide nanostructures for water splitting

    NASA Astrophysics Data System (ADS)

    Reyes Gil, Karla R.; Spurgeon, Joshua M.; Lewis, Nathan S.

    2009-08-01

    Inorganic semiconductors are promising materials for driving photoelectrochemical water-splitting reactions. However, there is not a single semiconductor material that can sustain the unassisted splitting of water into H2 and O2. Instead, we are developing a three part cell design where individual catalysts for water reduction and oxidation will be attached to the ends of a membrane. The job of splitting water is therefore divided into separate reduction and oxidation reactions, and each catalyst can be optimized independently for a single reaction. Silicon might be suitable to drive the water reduction. Inexpensive highly ordered Si wire arrays were grown on a single crystal wafer and transferred into a transparent, flexible polymer matrix. In this array, light would be absorbed along the longer axial dimension while the resulting electrons or holes would be collected along the much shorter radial dimension in a massively parallel array resembling carpet fibers on a microscale, hence the term "solar carpet". Tungsten oxide is a good candidate to drive the water oxidation. Self-organized porous tungsten oxide was successfully synthesized on the tungsten foil by anodization. This sponge-like structure absorbs light efficiently due to its high surface area; hence we called it "solar sponge".

  13. Transparent conductive oxides for thin-film silicon solar cells

    NASA Astrophysics Data System (ADS)

    Löffler, J.

    2005-04-01

    This thesis describes research on thin-film silicon solar cells with focus on the transparent conductive oxide (TCO) for such devices. In addition to the formation of a transparent and electrically conductive front electrode for the solar cell allowing photocurrent collection with low ohmic losses, the front TCO plays an important role for the light enhancement of thin-film silicon pin type solar cells. If the TCO is rough, light scattering at rough interfaces in the solar cell in combination with a highly reflective back contact leads to an increase in optical path length of the light. Multiple (total) internal reflectance leads to virtual 'trapping' of the light in the solar cell structure, allowing a further decrease in absorber thickness and thus thin-film silicon solar cell devices with higher and more stable efficiency. Here, the optical mechanisms involved in the light trapping in thin-film silicon solar cells have been studied, and two types of front TCO materials have been investigated with respect to their suitability as front TCO in thin-film silicon pin type solar cells. Undoped and aluminum doped zinc oxide layers have been fabricated for the first time by the expanding thermal plasma chemical vapour deposition (ETP CVD) technique at substrate temperatures between 150 º C and 350 º C, and successfully implemented as a front electrode material for amorphous silicon pin superstrate type solar cells. Solar cells with efficiencies comparable to cells on Asahi U-type reference TCO have been reproducibly obtained. A higher haze is needed for the ZnO samples studied here than for Asahi U-type TCO in order to achieve comparable long wavelength response of the solar cells. This is attributed to the different angular distribution of the scattered light, showing higher scattering intensities at large angles for the Asahi U-type TCO. A barrier at the TCO/p interface and minor collection problems may explain the slightly lower fill factors obtained for the cells

  14. Enhanced photothermal effect of surface oxidized silicon nanocrystals anchored to reduced graphene oxide nanosheets

    NASA Astrophysics Data System (ADS)

    Afshani, Parichehr; Moussa, Sherif; Atkinson, Garrett; Kisurin, Vitaly Y.; Samy El-Shall, M.

    2016-04-01

    We demonstrate the coupling of the photothermal effects of silicon nanocrystals and graphene oxide (GO) dispersed in water. Using laser irradiation (532 nm or 355 nm) of suspended Si nanocrystals in an aqueous solution of GO, the synthesis of surface oxidized Si-reduced GO nanocomposites (SiOx/Si-RGO) is reported. The laser reduction of GO is accompanied by surface oxidation of the Si nanocrystals resulting in the formation of the SiOx/Si-RGO nanocomposites. The SiOx/Si-RGO nanocomposites are proposed as promising materials for photothermal therapy and for the efficient conversion of solar energy into usable heat for a variety of thermal and thermomechanical applications.

  15. 22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

    SciTech Connect

    Geissbühler, Jonas Werner, Jérémie; Martin de Nicolas, Silvia; Hessler-Wyser, Aïcha; Tomasi, Andrea; Niesen, Bjoern; De Wolf, Stefaan; Barraud, Loris; Despeisse, Matthieu; Nicolay, Sylvain; Ballif, Christophe

    2015-08-24

    Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 °C—often needed for the curing of printed metal contacts—detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.

  16. 22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

    NASA Astrophysics Data System (ADS)

    Geissbühler, Jonas; Werner, Jérémie; Martin de Nicolas, Silvia; Barraud, Loris; Hessler-Wyser, Aïcha; Despeisse, Matthieu; Nicolay, Sylvain; Tomasi, Andrea; Niesen, Bjoern; De Wolf, Stefaan; Ballif, Christophe

    2015-08-01

    Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 °C—often needed for the curing of printed metal contacts—detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.

  17. Fabrication of p-type porous silicon nanowire with oxidized silicon substrate through one-step MACE

    SciTech Connect

    Li, Shaoyuan; Ma, Wenhui; Zhou, Yang; Chen, Xiuhua; Xiao, Yongyin; Ma, Mingyu; Wei, Feng; Yang, Xi

    2014-05-01

    In this paper, the simple pre-oxidization process is firstly used to treat the starting silicon wafer, and then MPSiNWs are successfully fabricated from the moderately doped wafer by one-step MACE technology in HF/AgNO{sub 3} system. The PL spectrum of MPSiNWs obtained from the oxidized silicon wafers show a large blue-shift, which can be attributed to the deep Q. C. effect induced by numerous mesoporous structures. The effects of HF and AgNO{sub 3} concentration on formation of SiNWs were carefully investigated. The results indicate that the higher HF concentration is favorable to the growth of SiNWs, and the density of SiNWs is significantly reduced when Ag{sup +} ions concentrations are too high. The deposition behaviors of Ag{sup +} ions on oxidized and unoxidized silicon surface were studied. According to the experimental results, a model was proposed to explain the formation mechanism of porous SiNWs by etching the oxidized starting silicon. - Graphical abstract: Schematic cross-sectional views of PSiNWs array formation by etching oxidized silicon wafer in HF/AgNO{sub 3} solution. (A) At the starting point; (B) during the etching process; and (C) after Ag dendrites remove. - Highlights: • Prior to etching, a simple pre-oxidation is firstly used to treat silicon substrate. • The medially doped p-type MPSiNWs are prepared by one-step MACE. • Deposition behaviors of Ag{sup +} ions on oxidized and unoxidized silicon are studied. • A model is finally proposed to explain the formation mechanism of PSiNWs.

  18. Oxidation of silicon nanoparticles produced by nanosecond laser ablation in liquids

    NASA Astrophysics Data System (ADS)

    Vaccaro, L.; Camarda, P.; Messina, F.; Buscarino, G.; Agnello, S.; Gelardi, F. M.; Cannas, M.; Boscaino, R.

    2014-10-01

    We investigated nanoparticles produced by laser ablation of silicon in water by the fundamental harmonic (1064 nm) of a ns pulsed Nd:YAG. The silicon oxidation is evidenced by IR absorption features characteristic of amorphous SiO2 (silica). This oxide is highly defective and manifests a luminescence activity under UV excitation: two emission bands at 2.7 eV and 4.4 eV are associated with the twofold coordinated silicon, =SiO••.

  19. Thermal degradation of ultrabroad bismuth NIR luminescence in bismuth-doped tantalum germanate laser glasses.

    PubMed

    Wang, Liping; Zhao, Yanqi; Xu, Shanhui; Peng, Mingying

    2016-04-01

    Because of ultra-broadband luminescence in 1000-1700 nm and consequent applications in fiber amplifier and lasers in the new spectral range where traditional rare earth cannot work, bismuth-doped laser glasses have received rising interest recently. For long-term practical application, thermal degradation must be considered for the glasses. This, however, has seldom been investigated. Here we report the thermal degradation of bismuth-doped germanate glass. Heating and cooling cycle experiments at high temperature reveal strong dependence of the thermal degradation on glass compositions. Bismuth and tantalum lead to the reversible degradation, while lithium can produce permanent irreversible degradation. The degradation becomes worse as lithium content increases in the glass. Absorption spectra show this is due to partial oxidation of bismuth near-infrared emission center. Surprisingly, we notice the emission of bismuth exhibits blueshift, rather than redshift at a higher temperature, and the blueshift can be suppressed by increasing the lithium content. PMID:27192231

  20. Research of materials for porous matrices in sol-gel systems based on silicon dioxide and metallic oxides

    NASA Astrophysics Data System (ADS)

    Maraeva, E. V.; Bobkov, A. A.; Maximov, A. I.; Moshnikov, V. A.; Nalimova, S. S.

    2015-11-01

    In this study silicon dioxide - stannic oxide and silicon dioxide - zinc nanomaterials oxide were obtained through sol-gel technology. The results of nitrogen thermal desorption measurements, atomic force microscopy measurements and particle sizes measurements are discussed.

  1. Energetics of bismuth vanadate

    SciTech Connect

    Nagabhushana, G.P.; Tavakoli, A.H.; Navrotsky, A.

    2015-05-15

    Bismuth vanadate has gained considerable interest as a photoanode for water splitting reactions under visible light. It exists in four different polymorphs, out of which three of them have been synthesized. Thermodynamic properties of these three polymorphs are investigated using high temperature oxide melt solution calorimetry. The monoclinic scheelite phase which exhibits photocatalytic activity under visible light is found to be the most stable polymorph, followed by tetragonal scheelite which exhibits activity under UV light. The photocatalytically inactive tetragonal zircon form is found to be the least stable polymorph. The small difference in enthalpy of formation between the two scheelite structures (−8 kJ/mol) is in accord with the reversibility of the transformation between them and the larger difference between the most stable monoclinic phase and the least stable tetragonal zircon phase (−23 kJ/mol) is in accord with the irreversible (monoclinic→tetragonal zircon) phase transformation. - Graphical abstract: Schematic representation of polymorphic transitions in BiVO{sub 4} along with their formation enthalpies. - Highlights: • Bismuth vanadate crystallizes in three different polymorphs. • High temperature calorimetric measurements were made to determine their formation enthalpies. • Enthalpy of formation decreases in the order BV-ms→BV-ts→BV-tz. • Photocatalytically active monoclinic-BiVO{sub 4} was found to be the most stable polymorph.

  2. Solid oxide membrane (SOM) process for ytterbium and silicon production from their oxides

    NASA Astrophysics Data System (ADS)

    Jiang, Yihong

    The Solid oxide membrane (SOM) electrolysis is an innovative green technology that produces technologically important metals directly from their respective oxides. A yttria-stabilized zirconia (YSZ) tube, closed at one end is employed to separate the molten salt containing dissolved metal oxides from the anode inside the YSZ tube. When the applied electric potential between the cathode in the molten salt and the anode exceeds the dissociation potential of the desired metal oxides, oxygen ions in the molten salt migrate through the YSZ membrane and are oxidized at the anode while the dissolved metal cations in the flux are reduced to the desired metal at the cathode. Compared with existing metal production processes, the SOM process has many advantages such as one unit operation, less energy consumption, lower capital costs and zero carbon emission. Successful implementation of the SOM electrolysis process would provide a way to mitigate the negative environmental impact of the metal industry. Successful demonstration of producing ytterbium (Yb) and silicon (Si) directly from their respective oxides utilizing the SOM electrolysis process is presented in this dissertation. During the SOM electrolysis process, Yb2O3 was reduced to Yb metal on an inert cathode. The melting point of the supporting electrolyte (LiF-YbF3-Yb2O3) was determined by differential thermal analysis (DTA). Static stability testing confirmed that the YSZ tube was stable with the flux at operating temperature. Yb metal deposit on the cathode was confirmed by scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS). During the SOM electrolysis process for silicon production, a fluoride based flux based on BaF2, MgF2, and YF3 was engineered to serve as the liquid electrolyte for dissolving silicon dioxide. YSZ tube was used to separate the molten salt from an anode current collector in the liquid silver. Liquid tin was chosen as cathode to dissolve the reduced silicon during

  3. Oxide impurities in silicon oxide intermetal dielectrics and their potential to elevate via-resistances.

    PubMed

    Qin, Wentao; Alldredge, Donavan; Heleotes, Douglas; Elkind, Alexander; Theodore, N David; Fejes, Peter; Vadipour, Mostafa; Godek, Bill; Lerner, Norman

    2014-08-01

    Silicon oxide used as an intermetal dielectric (IMD) incorporates oxide impurities during both its formation and subsequent processing to create vias in the IMD. Without a sufficient degassing of the IMD, oxide impurities released from the IMD during the physical vapor deposition (PVD) of the glue layer of the vias had led to an oxidation of the glue layer and eventual increase of the via resistances, which correlated with the O-to-Si atomic ratio of the IMD being ~10% excessive as verified by transmission electron microscopy (TEM) analysis. A vacuum bake of the IMD was subsequently implemented to enhance outgassing of the oxide impurities in the IMD before the glue layer deposition. The implementation successfully reduced the via resistances to an acceptable level.

  4. Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation.

    PubMed

    Chen, Yi Wei; Prange, Jonathan D; Dühnen, Simon; Park, Yohan; Gunji, Marika; Chidsey, Christopher E D; McIntyre, Paul C

    2011-06-19

    A leading approach for large-scale electrochemical energy production with minimal global-warming gas emission is to use a renewable source of electricity, such as solar energy, to oxidize water, providing the abundant source of electrons needed in fuel synthesis. We report corrosion-resistant, nanocomposite anodes for the oxidation of water required to produce renewable fuels. Silicon, an earth-abundant element and an efficient photovoltaic material, is protected by atomic layer deposition (ALD) of a highly uniform, 2 nm thick layer of titanium dioxide (TiO(2)) and then coated with an optically transmitting layer of a known catalyst (3 nm iridium). Photoelectrochemical water oxidation was observed to occur below the reversible potential whereas dark electrochemical water oxidation was found to have low-to-moderate overpotentials at all pH values, resulting in an inferred photovoltage of ~550 mV. Water oxidation is sustained at these anodes for many hours in harsh pH and oxidative environments whereas comparable silicon anodes without the TiO(2) coating quickly fail. The desirable electrochemical efficiency and corrosion resistance of these anodes is made possible by the low electron-tunnelling resistance (<0.006 Ω cm(2) for p(+)-Si) and uniform thickness of atomic-layer deposited TiO(2).

  5. Structural Evolution of Silicon Oxide Nanowires via Head-Growth Solid-Liquid-Solid Process

    NASA Astrophysics Data System (ADS)

    Hsu, Cheng-Hang; Chan, Shih-Yu; Chen, Chia-Fu

    2007-11-01

    In this paper, we propose a growth mechanism for silicon oxide nanowires (SiONWs) as a unique solid-liquid-solid process. SiONWs were synthesized in a furnace at 1000 °C and cooled at a high rate. Nickel and gold were introduced as catalysts to dissolve and precipitate the silicon oxide originally prepared by wet oxidation. The ratio of nickel to gold determined the precipitation rate and different “octopus-like” structures were formed. At a specific cooling rate, composition and amount of a catalyst, aligned silicon oxide nanowires with unattached ends were obtained.

  6. Surface recombination velocity of phosphorus-diffused silicon solar cell emitters passivated with plasma enhanced chemical vapor deposited silicon nitride and thermal silicon oxide

    NASA Astrophysics Data System (ADS)

    Kerr, M. J.; Schmidt, J.; Cuevas, A.; Bultman, J. H.

    2001-04-01

    The emitter saturation current density (JOe) and surface recombination velocity (Sp) of various high quality passivation schemes on phosphorus-diffused solar cell emitters have been determined and compared. The passivation schemes investigated were (i) stoichiometric plasma enhanced chemical vapor deposited (PECVD) silicon nitride (SiN), (ii) forming gas annealed thermally grown silicon oxide, and (iii) aluminum annealed (alnealed) thermal silicon oxide. Emitters with sheet resistances ranging from 30 to 430 and 50 to 380 Ω/□ were investigated for planar and random-pyramid textured silicon surfaces, which covers both industrial and laboratory emitters. The electronic surface passivation quality provided by PECVD SiN films was found to be good, with Sp values ranging from 1400 to 25 000 cm/s for planar emitters. Thin thermal silicon oxides were found to provide superior passivation to PECVD SiN, with the best passivation provided by an alnealed thin oxide (Sp values between 250 and 21 000 cm/s). The optimized PECVD SiN films are, nevertheless, sufficiently good for most silicon solar cell applications.

  7. Shrinking of silicon nanocrystals embedded in an amorphous silicon oxide matrix during rapid thermal annealing in a forming gas atmosphere

    NASA Astrophysics Data System (ADS)

    van Sebille, M.; Fusi, A.; Xie, L.; Ali, H.; van Swaaij, R. A. C. M. M.; Leifer, K.; Zeman, M.

    2016-09-01

    We report the effect of hydrogen on the crystallization process of silicon nanocrystals embedded in a silicon oxide matrix. We show that hydrogen gas during annealing leads to a lower sub-band gap absorption, indicating passivation of defects created during annealing. Samples annealed in pure nitrogen show expected trends according to crystallization theory. Samples annealed in forming gas, however, deviate from this trend. Their crystallinity decreases for increased annealing time. Furthermore, we observe a decrease in the mean nanocrystal size and the size distribution broadens, indicating that hydrogen causes a size reduction of the silicon nanocrystals.

  8. Tantalum oxide/silicon nitride: A negatively charged surface passivation stack for silicon solar cells

    SciTech Connect

    Wan, Yimao Bullock, James; Cuevas, Andres

    2015-05-18

    This letter reports effective passivation of crystalline silicon (c-Si) surfaces by thermal atomic layer deposited tantalum oxide (Ta{sub 2}O{sub 5}) underneath plasma enhanced chemical vapour deposited silicon nitride (SiN{sub x}). Cross-sectional transmission electron microscopy imaging shows an approximately 2 nm thick interfacial layer between Ta{sub 2}O{sub 5} and c-Si. Surface recombination velocities as low as 5.0 cm/s and 3.2 cm/s are attained on p-type 0.8 Ω·cm and n-type 1.0 Ω·cm c-Si wafers, respectively. Recombination current densities of 25 fA/cm{sup 2} and 68 fA/cm{sup 2} are measured on 150 Ω/sq boron-diffused p{sup +} and 120 Ω/sq phosphorus-diffused n{sup +} c-Si, respectively. Capacitance–voltage measurements reveal a negative fixed insulator charge density of −1.8 × 10{sup 12 }cm{sup −2} for the Ta{sub 2}O{sub 5} film and −1.0 × 10{sup 12 }cm{sup −2} for the Ta{sub 2}O{sub 5}/SiN{sub x} stack. The Ta{sub 2}O{sub 5}/SiN{sub x} stack is demonstrated to be an excellent candidate for surface passivation of high efficiency silicon solar cells.

  9. Oxidatively Stable Nanoporous Silicon Photocathodes for Photoelectrochemical Hydrogen Evolution

    SciTech Connect

    Neale, Nathan R.; Zhao, Yixin; Zhu, Kai; Oh, Jihun; van de Lagemaat, Jao; Yuan, Hao-Chih; Branz, Howard M.

    2014-06-02

    Stable and high-performance nanoporous 'black silicon' photoelectrodes with electrolessly deposited Pt nanoparticle (NP) catalysts are made with two metal-assisted etching steps. Doubly etched samples exhibit >20 mA/cm2 photocurrent density at +0.2 V vs. reversible hydrogen electrode (RHE) for photoelectrochemical hydrogen evolution under 1 sun illumination. We find that the photocurrent onset voltage of black Si photocathodes prepared from single-crystal planar Si wafers increases in oxidative environments (e.g., aqueous electrolyte) owing to a positive flat-band potential shift caused by surface oxidation. However, this beneficial oxide layer becomes a kinetic barrier to proton reduction that inhibits hydrogen production after just 24 h. To mitigate this problem, we developed a novel second Pt-assisted etch process that buries the Pt NPs deeper into the nanoporous Si surface. This second etch shifts the onset voltage positively, from +0.25 V to +0.4 V vs. RHE, and reduces the charge-transfer resistance with no performance decrease seen for at least two months.

  10. Improved performance of microcrystalline silicon solar cell with graded-band-gap silicon oxide buffer layer

    NASA Astrophysics Data System (ADS)

    Shi, Zhen-Liang; Ji, Yun; Yu, Wei; Yang, Yan-Bin; Cong, Ri-Dong; Chen, Ying-Juan; Li, Xiao-Wei; Fu, Guang-Sheng

    2015-07-01

    Microcrystalline silicon (μc-Si:H) solar cell with graded band gap microcrystalline silicon oxide (μc-SiOx:H) buffer layer is prepared by plasma enhanced chemical vapor deposition and exhibits improved performance compared with the cell without it. The buffer layer moderates the band gap mismatch by reducing the barrier of the p/i interface, which promotes the nucleation of the i-layer and effectively eliminates the incubation layer, and then enhances the collection efficiency of the cell in the short wavelength region of the spectrum. The p/i interface defect density also decreases from 2.2 × 1012 cm-2 to 5.0 × 1011 cm-2. This graded buffer layer allows to simplify the deposition process for the μc-Si:H solar cell application. Project supported by the Key Basic Research Project of Hebei Province, China (Grant Nos. 12963930D and 12963929D), the Natural Science Foundation of Hebei Province, China (Grant Nos. F2013201250 and E2012201059), and the Science and Technology Research Projects of the Education Department of Hebei Province, China (Grant No. ZH2012030).

  11. Surface kinetics modeling of silicon and silicon oxide plasma etching. III. Modeling of silicon oxide etching in fluorocarbon chemistry using translating mixed-layer representation

    SciTech Connect

    Kwon, Ohseung; Bai Bo; Sawin, Herbert H.

    2006-09-15

    Silicon oxide etching was modeled using a translating mixed-layer model, a novel surface kinetic modeling technique, and the model showed good agreement with measured data. Carbon and fluorine were identified as the primary contributors to deposition and etching, respectively. Atomic fluorine flux is a major factor that determines the etching behavior. With a chemistry having a small amount of atomic fluorine (such as the C{sub 4}F{sub 8} chemistry), etching yield shows stronger dependence on the composition change in the gas flux.

  12. Monolithic integration of rare-earth oxides and semiconductors for on-silicon technology

    SciTech Connect

    Dargis, Rytis Clark, Andrew; Erdem Arkun, Fevzi; Grinys, Tomas; Tomasiunas, Rolandas; O'Hara, Andy; Demkov, Alexander A.

    2014-07-01

    Several concepts of integration of the epitaxial rare-earth oxides into the emerging advanced semiconductor on silicon technology are presented. Germanium grows epitaxially on gadolinium oxide despite lattice mismatch of more than 4%. Additionally, polymorphism of some of the rare-earth oxides allows engineering of their crystal structure from hexagonal to cubic and formation of buffer layers that can be used for growth of germanium on a lattice matched oxide layer. Molecular beam epitaxy and metal organic chemical vapor deposition of gallium nitride on the rare-earth oxide buffer layers on silicon is discussed.

  13. X-ray reflectivity study of formation of multilayer porous anodic oxides of silicon.

    SciTech Connect

    Chu, Y.; Fenollosa, R.; Parkhutik, V.; You, H.

    1999-07-21

    The paper reports data on the kinetics of anodic oxide films growth on silicon in aqueous solutions of phosphoric acids as well as a study of the morphology of the oxides grown in a special regime of the oscillating anodic potential. X-ray reflectivity measurements were performed on the samples of anodic oxides using an intense synchrotron radiation source. They have a multilayer structure as revealed by theoretical fitting of the reflectivity data. The oscillations of the anodic potential are explained in terms of synchronized oxidation/dissolution reactions at the silicon surface and accumulation of mechanic stress in the oxide film.

  14. Assessment of the influence of surface finishing and weld joints on the corrosion/oxidation behaviour of stainless steels in lead bismuth eutectic

    NASA Astrophysics Data System (ADS)

    Martín-Muñoz, F. J.; Soler-Crespo, L.; Gómez-Briceño, D.

    2011-09-01

    The objective of this paper is to gain some insight into the influence of the surface finishing in the oxidation/corrosion behaviour of 316L and T91 steels in lead bismuth eutectic (LBE). Specimens of both materials with different surface states were prepared (as-received, grinded, grinded and polished, and electrolitically polished) and oxidation tests were carried out at 775 and 825 K from 100 to 2000 h for two different oxygen concentrations and for H 2/H 2O molar ratios of 3 and 0.03. The general conclusion for these tests is that the effect of surface finishing on the corrosion/protection processes is not significant under the tested conditions. In addition the behaviour of weld joints, T91-T91 Tungsten Inert Gas (TIG) and T91-316L have been also studied under similar conditions. The conclusions are that, whereas T91-T91 welded joint shows the same corrosion properties as the parent materials for the conditions tested, AISI 316L-T91 welded joint, present an important dissolution over seam area that it associated to the electrode 309S used for the fabrication process.

  15. High-temperature oxidation behavior of reaction-formed silicon carbide ceramics

    NASA Technical Reports Server (NTRS)

    Ogbuji, Linus U. J. T.; Singh, M.

    1995-01-01

    The oxidation behavior of reaction-formed silicon carbide (RFSC) ceramics was investigated in the temperature range of 1100 to 1400 C. The oxidation weight change was recorded by TGA; the oxidized materials were examined by light and electron microscopy, and the oxidation product by x-ray diffraction analysis (XRD). The materials exhibited initial weight loss, followed by passive weight gain (with enhanced parabolic rates, k(sub p)), and ending with a negative (logarithmic) deviation from the parabolic law. The weight loss arose from the oxidation of residual carbon, and the enhanced k(sub p) values from internal oxidation and the oxidation of residual silicon, while the logarithmic kinetics is thought to have resulted from crystallization of the oxide. The presence of a small amount of MoSi, in the RFSC material caused a further increase in the oxidation rate. The only solid oxidation product for all temperatures studied was silica.

  16. Effect of cold rolling on the oxidation resistance of T91 steel in oxygen-saturated stagnant liquid lead-bismuth eutectic at 450 °C and 550 °C

    NASA Astrophysics Data System (ADS)

    Dong, Hong; Ye, Zhongfei; Wang, Pei; Li, Dianzhong; Zhang, Yutuo; Li, Yiyi

    2016-08-01

    The compatibility of T91 steels having different preparation processes with oxygen-saturated stagnant lead-bismuth eutectic have been investigated at 450 °C and 550 °C. It is found that cold rolling decreases the thickness of the oxide scale of T91 steel by forming a continuous enhanced Cr-rich belt in the inner oxide layer next to the internal oxidation zone, which is attributed to the rapid diffusion of Cr induced by numerous non-equilibrium grain boundaries and migrating dislocations.

  17. Sub-50 nm positioning of organic compounds onto silicon oxide patterns fabricated by local oxidation nanolithography.

    PubMed

    Losilla, N S; Oxtoby, N S; Martinez, J; Garcia, F; Garcia, R; Mas-Torrent, M; Veciana, J; Rovira, C

    2008-11-12

    We present a process to fabricate molecule-based nanostructures by merging a bottom-up interaction and a top-down nanolithography. Direct nanoscale positioning arises from the attractive electrostatic interactions between the molecules and silicon dioxide nanopatterns. Local oxidation nanolithography is used to fabricate silicon oxide domains with variable gap separations ranging from 40 nm to several microns in length. We demonstrate that an ionic tetrathiafulvalene (TTF) semiconductor can be directed from a macroscopic liquid solution (1 µM) and selectively deposited onto predefined nanoscale regions of a 1 cm(2) silicon chip with an accuracy of 40 nm.

  18. Comparison of the synthesis of Ge nanocrystals in hafnium aluminum oxide and silicon oxide matrices.

    PubMed

    Chew, H G; Zheng, F; Choi, W K; Chim, W K; Fitzgerald, E A; Foo, Y L

    2009-02-01

    Growth of germanium (Ge) nanocrystals in silicon (Si) oxide and hafnium aluminum oxide (HfAlO) is examined. In Si oxide, nanocrystals were able to form at annealing temperatures of 800 degrees C to 1000 degrees C. Nanocrystals formed at 800 degrees C were round and approximately 8 nm in diameter, at 900 degrees C they become facetted and at 1000 degrees C they become spherical again. In HfAlO, at 800 degrees C nanocrystals formed are relatively smaller (approximately 3 nm in diameter) and lower in density. While at 900 degrees C and 1000 degrees C, nanocrystals did not form due to out-diffusion of Ge. Different nanocrystal formation characteristics in the matrices are attributed to differences in their crystallization temperatures.

  19. Structural alloy with a protective coating containing silicon or silicon-oxide

    DOEpatents

    Natesan, Ken

    1994-01-01

    An iron-based alloy containing chromium and optionally, nickel. The alloy has a surface barrier of silicon or silicon plus oxygen which converts at high temperature to a protective silicon compound. The alloy can be used in oxygen-sulfur mixed gases at temperatures up to about 1100.degree. C.

  20. Structural alloy with a protective coating containing silicon or silicon-oxide

    DOEpatents

    Natesan, K.

    1992-01-01

    This invention is comprised of an iron-based alloy containing chromium and optionally, nickel. The alloy has a surface barrier of silicon or silicon plus oxygen which converts at high temperature to a protective silicon compound. The alloy can be used in oxygen-sulfur mixed gases at temperatures up to about 1100{degrees}C.

  1. Structural alloy with a protective coating containing silicon or silicon-oxide

    DOEpatents

    Natesan, K.

    1994-12-27

    An iron-based alloy is described containing chromium and optionally, nickel. The alloy has a surface barrier of silicon or silicon plus oxygen which converts at high temperature to a protective silicon compound. The alloy can be used in oxygen-sulfur mixed gases at temperatures up to about 1100 C. 8 figures.

  2. Silicon nanoprofiling with the use of a solid aluminum oxide mask and combined 'dry' etching

    SciTech Connect

    Belov, A. N.; Demidov, Yu. A.; Putrya, M. G.; Golishnikov, A. A.; Vasilyev, A. A.

    2009-12-15

    Technological features of nanoprofiling of silicon protected by a solid mask based on porous aluminum oxide are considered. It is shown that, for a nanoprofiled silicon surface to be formed, it is advisable that combined dry etching be used including preliminary bombardment of structures with accelerated neutral atoms of an inert gas followed by reactive ion etching.

  3. Method of fabricating conducting oxide-silicon solar cells utilizing electron beam sublimation and deposition of the oxide

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1979-01-01

    In preparing tin oxide and indium tin oxide-silicon heterojunction solar cells by electron beam sublimation of the oxide and subsequent deposition thereof on the silicon, the engineering efficiency of the resultant cell is enhanced by depositing the oxide at a predetermined favorable angle of incidence. Typically the angle of incidence is between 40.degree. and 70.degree. and preferably between 55.degree. and 65.degree. when the oxide is tin oxide and between 40.degree. and 70.degree. when the oxide deposited is indium tin oxide. gi The Government of the United States of America has rights in this invention pursuant to Department of Energy Contract No. EY-76-C-03-1283.

  4. Synchrotron x-ray reflectivity study of oxidation/passivation of copper and silicon.

    SciTech Connect

    Chu, Y.; Nagy, Z.; Parkhutik, V.; You, H.

    1999-07-21

    Synchrotron x-ray-scattering technique studies of copper and silicon electrochemical interfaces are reported. These two examples illustrate the application of synchrotron x-ray techniques for oxidation, passivation, and dissolution of metals and semiconductors.

  5. Large area nanoscale patterning of silicon surfaces by parallel local oxidation.

    PubMed

    Losilla, N S; Martínez, J; García, R

    2009-11-25

    The homogeneity and the reproducibility of parallel local oxidation have been improved by introducing a thin film of polymethylmethacrylate (PMMA) between the stamp and the silicon surface. The flexibility of the polymer film enables a homogeneous contact of the stamp with the silicon surface to be achieved. The oxides obtained yield better aspect ratios compared with the ones created with no PMMA layer. The pattern is formed when a bias voltage is applied between the stamp and the silicon surface for 1 min. The patterning can be done by a step and repeat technique and is reproducible across a centimetre length scale. Once the oxide nanostructures have been created, the polymer is removed by etching in acetone. Finally, parallel local oxidation is applied to fabricate silicon nanostructures and templates for the growth of organic molecules.

  6. Modelling and engineering of stress based controlled oxidation effects for silicon nanostructure patterning

    NASA Astrophysics Data System (ADS)

    Han, Xiang-Lei; Larrieu, Guilhem; Krzeminski, Christophe

    2013-12-01

    Silicon nanostructure patterning with tight geometry control is an important challenge at the bottom level. In that context, stress based controlled oxidation appears to be an efficient tool for precise nanofabrication. Here, we investigate the stress-retarded oxidation phenomenon in various silicon nanostructures (nanobeams, nanorings and nanowires) at both the experimental and the theoretical levels. Different silicon nanostructures have been fabricated by a top-down approach. Complex dependence of the stress build-up on the nano-object’s dimension, shape and size has been demonstrated experimentally and physically explained by modelling. For the oxidation of a two-dimensional nanostructure (nanobeam), relative independence to size effects has been observed. On the other hand, radial stress increase with geometry downscaling of a one-dimensional nanostructure (nanowire) has been carefully emphasized. The study of shape engineering by retarded oxidation effects for vertical silicon nanowires is finally discussed.

  7. Method for forming indium oxide/n-silicon heterojunction solar cells

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1984-03-13

    A high photo-conversion efficiency indium oxide/n-silicon heterojunction solar cell is spray deposited from a solution containing indium trichloride. The solar cell exhibits an Air Mass One solar conversion efficiency in excess of about 10%.

  8. Nano crystalline Bi2(VO5) phases in lithium bismuth borate glasses containing mixed vanadium-nickel oxides

    NASA Astrophysics Data System (ADS)

    Yadav, Arti; Khasa, S.; Dahiya, M. S.; Agarwal, A.

    2016-05-01

    Glass composition 7V2O5.23Li2O.20Bi2O3.50B2O3 and x(2NiO.V2O5).(30-x)Li2O.20Bi2O3.50B2O3, x=0, 2, 5, 7 and 10, were produced by conventional melt quenching technique. The quenched amorphous glass samples were annealed at temperatures 400°C and 500°C for 6 hours. The Bi2(VO5) crystallite were grown in all prepared glass matrix. Tn vanadium lithium bismuth borate glass (annealed), the some phrase of V2O5-crystal were observed along with the nano crystalline Bi2(VO5) phase. The sharp peaks in FTTR spectra of all annealed compositions were also compatible with the XRD diffraction peaks of the system under investigation. Average crystalline size (D) of the Bi2(VO5) nano-crystallite was ~30nm for samples annealed at 400°C and ~42nm for samples annealed at 500°C. Lattice parameter and the lattice strain for all the samples was also calculated corresponding to the (113) plane of Bi2(VO5) crystallite.

  9. Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

    SciTech Connect

    Fiorentino, Giuseppe Morana, Bruno; Forte, Salvatore; Sarro, Pasqualina Maria

    2015-01-15

    In this paper, the authors study the protective effect against oxidation of a thin layer of atomic layer deposited (ALD) aluminum oxide (Al{sub 2}O{sub 3}). Nitrogen doped silicon carbide (poly-SiC:N) based microheaters coated with ALD Al{sub 2}O{sub 3} are used as test structure to investigate the barrier effect of the alumina layers to oxygen and water vapor at very high temperature (up to 1000 °C). Different device sets have been fabricated changing the doping levels, to evaluate possible interaction between the dopants and the alumina layer. The as-deposited alumina layer morphology has been evaluated by means of AFM analysis and compared to an annealed sample (8 h at 1000 °C) to estimate the change in the grain structure and the film density. The coated microheaters are subjected to very long oxidation time in dry and wet environment (up to 8 h at 900 and 1000 °C). By evaluating the electrical resistance variation between uncoated reference devices and the ALD coated devices, the oxide growth on the SiC is estimated. The results show that the ALD alumina coating completely prevents the oxidation of the SiC up to 900 °C in wet environment, while an oxide thickness reduction of 50% is observed at 1000 °C compared to uncoated devices.

  10. Resistive Switching and Memory effects in Silicon Oxide Based Nanostructures

    NASA Astrophysics Data System (ADS)

    Yao, Jun

    Silicon oxide (SiOx 1 < x ≦2) has long been used and considered as a passive and insulating component in the construction of electronic devices. In contrast, here the active role of SiOx in constructing a type of resistive switching memory is studied. From electrode-independent electrical behaviors to the visualization of the conducting filament inside the SiOx matrix, the intrinsic switching picture in SiOx is gradually revealed. The thesis starts with the introduction of some similar phenomenological switching behaviors in different electronic structures (Chapter 1), and then generalizes the electrode-material-independent electrical behaviors on SiOx substrates, providing indirect evidence to the intrinsic SiOx switching (Chapter 2). From planar nanogap systems to vertical sandwiched structures, Chapter 3 further discusses the switching behaviors and properties in SiOx. By localization of the switching site, the conducting filament in SiOx is visualized under transmission electron microscope using both static and in situ imaging methods (Chapter 4). With the intrinsic conduction and switching in SiO x largely revealed, Chapter 5 discusses its impact and implications to the molecular electronics and nanoelectronics where SiOx is constantly used. As comparison, another type of memory effect in semiconductors (carbon nanotubes) based on charge trapping at the semiconductor/SiO x interface is discussed (Chapter 6).

  11. Simulation study of water/silicon oxide interface

    NASA Astrophysics Data System (ADS)

    Lorenz, Christian; Rempe, Susan; Stevens, Mark; Grest, Gary; Tsige, Mesfin

    2006-03-01

    The interaction of water with solid surfaces plays a crucial role in many phenomena. The water-silica interface is one of the typical systems encountered in technological and natural materials. Numerous technological applications of silica were found to rely on its specific surface properties. Large scale quantum mechanics (QM) and classical molecular dynamics (MD) simulations are used to study the molecular configurations and wetting properties of water at the interface of different silicon oxide surfaces. In order to understand how the surface coverage of silanols (-SiOH) affects the wetting behavior of the silica surfaces, both crystalline ((001) α-quartz (coverage 9.6 nm-2) and (100) β-cristobalite (7.8 nm-2)) and amorphous silica (5.0 nm-2) substrates have been studied. The binding energy of the water, the number of water molecules hydrogen-bonded to the surface and the configuration of the hydrogen-bonded water molecules are determined as a function of silanol coverage from QM simulations. The number of water molecules within a monolayer and the orientation of the water molecules within the monolayer and in the bulk are determined from MD simulations. Results from two classical force fields are compared to one another and to the relevant quantities from the QM simulations. Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy's National Nuclear Security Administration under contract DE-AC04-94AL85000.

  12. Silicon oxide permeation barrier coating of PET bottles and foils

    NASA Astrophysics Data System (ADS)

    Steves, Simon; Deilmann, Michael; Awakowicz, Peter

    2009-10-01

    Modern packaging materials such as polyethylene terephthalate (PET) have displaced established materials in many areas of food and beverage packaging. Plastic packing materials offer are various advantages concerning production and handling. PET bottles for instance are non-breakable and lightweight compared to glass and metal containers. However, PET offers poor barrier properties against gas permeation. Therefore, the shelf live of packaged food is reduced. Permeation of gases can be reduced by depositing transparent plasma polymerized silicon oxide (SiOx) barrier coatings. A microwave (2.45 GHz) driven low pressure plasma reactor is developed based on a modified Plasmaline antenna to treat PET foils or bottles. To increase the barrier properties of the coatings furthermore a RF substrate bias (13.56 MHz) is applied. The composition of the coatings is analyzed by means of Fourier transform infrared (FTIR) spectroscopy regarding carbon and hydrogen content. Influence of gas phase composition and substrate bias on chemical composition of the coatings is discussed. A strong relation between barrier properties and film composition is found: good oxygen barriers are observed as carbon content is reduced and films become quartz-like. Regarding oxygen permeation a barrier improvement factor (BIF) of 70 is achieved.

  13. Alkyl monolayer passivated metal-semiconductor diodes: 2: Comparison with native silicon oxide.

    PubMed

    Liu, Yong-Jun; Yu, Hua-Zhong

    2003-04-14

    To understand the electrical properties at passivated metal-semiconductor interfaces, two types of mercury-insulator-silicon (n-type) junctions, Hg\\C10H21-Si and Hg\\SiO2-Si, were fabricated and their current-voltage and capacitance-voltage characteristics compared. Both of them exhibited near-ideal rectifying characteristics with an excellent saturation current at reverse bias, which is in contrast to the previously reported ohmic behavior of an unmodified mercury-silicon junction. The experimental results also indicated that the n-decyl monolayer passivated junction possesses a higher effective barrier height, a lower ideality factor (that is, closer to unity), and better reproducibility than that of native silicon oxide. In addition, the dopant density and build-in potential, extracted from capacitance-voltage measurements of these passivated mercury-silicon junctions, revealed that alkyl monolayer derivatization does not alter the intrinsic properties of the silicon substrate. The calculated surface state density at the alkyl monolayer\\silicon interface is lower than that of the silicon oxide\\silicon interface. The present study increases the possibility of using advanced organic materials as ultrathin insulator layers for miniaturized, silicon-based microelectronic devices.

  14. Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process

    DOEpatents

    McKee, Rodney A.; Walker, Frederick J.

    1993-01-01

    A process and structure involving a silicon substrate utilizes an ultra high vacuum and molecular beam epitaxy (MBE) methods to grow an epitaxial oxide film upon a surface of the substrate. As the film is grown, the lattice of the compound formed at the silicon interface becomes stabilized, and a base layer comprised of an oxide having a sodium chloride-type lattice structure grows epitaxially upon the compound so as to cover the substrate surface. A perovskite may then be grown epitaxially upon the base layer to render a product which incorporates silicon, with its electronic capabilities, with a perovskite having technologically-significant properties of its own.

  15. Atomic layer deposition of bismuth oxide using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O

    SciTech Connect

    Austin, Dustin Z. Conley, John F.; Allman, Derryl; Price, David; Hose, Sallie; Saly, Mark

    2014-01-15

    Bismuth oxide thin films were deposited by atomic layer deposition using Bi(OCMe{sub 2}{sup i}Pr){sub 3} and H{sub 2}O at deposition temperatures between 90 and 270 °C on Si{sub 3}N{sub 4}, TaN, and TiN substrates. Films were analyzed using spectroscopic ellipsometry, x-ray diffraction, x-ray reflectivity, high-resolution transmission electron microscopy, and Rutherford backscattering spectrometry. Bi{sub 2}O{sub 3} films deposited at 150 °C have a linear growth per cycle of 0.039 nm/cycle, density of 8.3 g/cm{sup 3}, band gap of approximately 2.9 eV, low carbon content, and show the β phase structure with a (201) preferred crystal orientation. Deposition temperatures above 210 °C and postdeposition anneals caused uneven volumetric expansion, resulting in a decrease in film density, increased interfacial roughness, and degraded optical properties.

  16. In situ transmission infrared spectroscopy of high-kappa oxide atomic layer deposition onto silicon surfaces

    NASA Astrophysics Data System (ADS)

    Ho, Ming-Tsung

    Ultra-thin aluminum oxide (Al2O3) and hafnium oxide (HfO2) layers have been grown by atomic layer deposition (ALD) using tri-methyl-aluminum (TMA) and tetrakis-ethyl-methyl-amino-hafnium (TEMAH) respectively with heavy water (D2O) as the oxidizing agent. Several different silicon surfaces were used as substrates such as hydrogen terminated silicon (H/Si), SC2 (or RCA 2) cleaned native silicon oxide (SiO 2/Si), and silicon (oxy)nitride. In-situ transmission Fourier transform infrared spectroscopy (FTIR) has been adopted for the study of the growth mechanisms during ALD of these films. The vibrational spectra of gas phase TEMAH and its reaction byproducts with oxidants have also been investigated. Density functional theory (DFT) normal mode calculations show a good agreement with the experimental data when it is combined with linear wave-number scaling method and Fermi resonance mechanism. Ether (-C-O-C-) and tertiary alkylamine (N(R1R 2R3)) compounds are the two most dominant products of TEMAH reacting with oxygen gas and water. When ozone is used as the oxidant, gas phase CH2O, CH3NO2, CH3-N=C=O and other compounds containing -(C=O)- and --C-O-C- (or --O-C-) segments are observed. With substrate temperatures less than 400°C and 300°C for TMA and TEMAH respectively, Al oxide and Hf oxide ALD can be appropriately performed on silicon surfaces. Thin silicon (oxy)nitride thermally grown in ammonia on silicon substrate can significantly reduce silicon oxide interlayer formation during ALD and post-deposition annealing. The crystallization temperature of amorphous ALD grown HfO2 on nitridized silicon is 600°C, which is 100°C higher than on the other silicon surfaces. When HfO2 is grown on H/Si(111) at 100°C deposition temperature, minimum 5--10 ALD cycles are required for the full surface coverage. The steric effect can be seen by the evolution of the H-Si stretching mode at 2083 cm-1. The observed red shift of H-Si stretching to ˜ 2060 cm-1 can be caused by Si

  17. A silicon doped hafnium oxide ferroelectric p-n-p-n SOI tunneling field-effect transistor with steep subthreshold slope and high switching state current ratio

    NASA Astrophysics Data System (ADS)

    Marjani, Saeid; Hosseini, Seyed Ebrahim; Faez, Rahim

    2016-09-01

    In this paper, a silicon-on-insulator (SOI) p-n-p-n tunneling field-effect transistor (TFET) with a silicon doped hafnium oxide (Si:HfO2) ferroelectric gate stack is proposed and investigated via 2D device simulation with a calibrated nonlocal band-to-band tunneling model. Utilization of Si:HfO2 instead of conventional perovskite ferroelectrics such as lead zirconium titanate (PbZrTiO3) and strontium bismuth tantalate (SrBi2Ta2O9) provides compatibility to the CMOS process as well as improved device scalability. By using Si:HfO2 ferroelectric gate stack, the applied gate voltage is effectively amplified that causes increased electric field at the tunneling junction and reduced tunneling barrier width. Compared with the conventional p-n-p-n SOI TFET, the on-state current and switching state current ratio are appreciably increased; and the average subthreshold slope (SS) is effectively reduced. The simulation results of Si:HfO2 ferroelectric p-n-p-n SOI TFET show significant improvement in transconductance (˜9.8X enhancement) at high overdrive voltage and average subthreshold slope (˜35% enhancement over nine decades of drain current) at room temperature, indicating that this device is a promising candidate to strengthen the performance of p-n-p-n and conventional TFET for a switching performance.

  18. Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F{sub 2} remote plasmas

    SciTech Connect

    Yun, Y. B.; Park, S. M.; Kim, D. J.; Lee, N.-E.; Kim, K. S.; Bae, G. H.

    2007-07-15

    The authors investigated the effects of various additive gases and different injection methods on the chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F{sub 2} remote plasmas. N{sub 2} and N{sub 2}+O{sub 2} gases in the F{sub 2}/Ar/N{sub 2} and F{sub 2}/Ar/N{sub 2}/O{sub 2} remote plasmas effectively increased the etch rate of the layers. The addition of direct-injected NO gas increased the etch rates most significantly. NO radicals generated by the addition of N{sub 2} and N{sub 2}+O{sub 2} or direct-injected NO molecules contributed to the effective removal of nitrogen and oxygen in the silicon nitride and oxide layers, by forming N{sub 2}O and NO{sub 2} by-products, respectively, and thereby enhancing SiF{sub 4} formation. As a result of the effective removal of the oxygen, nitrogen, and silicon atoms in the layers, the chemical dry etch rates were enhanced significantly. The process regime for the etch rate enhancement of the layers was extended at elevated temperature.

  19. Method for one-to-one polishing of silicon nitride and silicon oxide

    NASA Technical Reports Server (NTRS)

    Babu, Suryadevara V. (Inventor); Natarajan, Anita (Inventor)

    2009-01-01

    The present invention provides a method of removing silicon nitride at about the same removal rate as silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and additives that modulate the silicon dioxide and silicon nitride removal rates such that they are about the same. In one embodiment of the invention, the additive is lysine or lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8. In another embodiment of the invention, the additive is arginine in combination with picolinic acid, which is effective at a pH of about 10.

  20. Investigation of the oxidative ammonolysis of propylene on oxide catalysts containing molybdenum and using the response method

    SciTech Connect

    Gadzhiev, K.N.; Adzhamov, K.Y.; Alkhazov, T.G.; Khanmamedova, A.K.

    1985-07-01

    The response method has been used to study the oxidative ammonolysis of propylene on MoO/sub 3/ and molybdenum oxide systems containing bismuth, silicon, and phosphorous ions. The response curves obtained for ammonia, propylene, CO/sub 2/, acrolein, acrylonitrile in these systems are discussed and compared with individual molybdenum trioxide. It has been shown that the modifying action of ammonia on the catalyst surfaces determines the direction of the oxidative conversion of the propylene.

  1. Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation.

    PubMed

    Teo, E J; Bettiol, A A; Yang, P; Breese, M B H; Xiong, B Q; Mashanovich, G Z; Headley, W R; Reed, G T

    2009-03-01

    We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1x10(15)/cm(2) after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1+/-0.4 dB/cm and 1.2+/-0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications.

  2. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NASA Astrophysics Data System (ADS)

    van Hattum, E. D.

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, where the SiOx layer is used as the charge retention layer on the drums for copying and printing devices. The thesis describes investigations of the plasma and of processes taking place on the sputter target and on the SiOx growth surface in the room temperature, RF reactive magnetron plasma sputter deposition technology. The sputtering target consists of silicon and the reactive atmosphere consists of an Ar/O2 mixture. The composition of the grown SiOx layers has been varied between x=0 and x=2 by variation of the O2 partial pressure. The characteristics of the growth process have been related to the nanostructural properties of the grown films. The deposition system enables the characterisation of the plasma (Langmuir probe, energy resolved mass spectrometer) and of the growing film (Elastic Recoil Detection (ERD), Fourier transform infrared absorption spectroscopy) and is connected to a beamline of a 6MV tandem van de Graaff accelerator. Also Rutherford Backscattering Spectrometry and X-ray Photoelectron Spectroscopy have been applied. It is shown how ERD can be used as a real-time in-situ technique. The thesis presents spatially resolved values of the ion density, electron temperature and the quasi-electrostatic potential, determined using a Langmuir probe. The plasma potential has a maximum about 2 cm from the cathode erosion area, and decreases (more than 200 V typically) towards the floating sputter cathode. The potential decreases slightly in the direction towards the grounded growth surface and the positive, mainly Ar+, ions created in the large volume of the plasma closest to the substrate are accelerated towards the growth surface. These ions obtain a few eV of

  3. Metal-oxide-semiconductor characterization of silicon surfaces thermally oxidized after reactive ion etching and magnetically enhanced reactive ion etching

    SciTech Connect

    Settlemyer, K.T. Jr.; Ruzyllo, J.; Hwang, D.K.

    1993-03-01

    In this study the performance of reactive ion etching (RIE) and magnetically enhanced reactive ion etching (MERIE) processes in pregate oxidation etching of the field oxide are compared. The comparison is carried out through metal-oxide-semiconductor (MOS) characterization of oxides and interfaces formed on etched silicon surfaces. The results revealed differences in the outcome of RIE and MERIE processes with the latter displaying overall superior characteristics. MERIE induced surface damage is shallower, and is mostly removed during oxide growth. RIE damage propagates deeper into the Si bulk and still influences the MOS devices even after the top Si layers are converted into the oxide. The results obtained emphasize the importance of adequate cleaning of silicon surfaces following RIE/MERIE processes. 5 refs., 4 figs.

  4. Dimethyl sulfoxide as a mild oxidizing agent for porous silicon and its effect on photoluminescence

    SciTech Connect

    Song, J.H.; Sailor, M.J.

    1998-06-29

    Dimethyl sulfoxide acts as a mild room-temperature oxidant of luminescent porous silicon. The oxidation reaction is accompanied by a loss in photoluminescence intensity from the silicon nanocrystallites, indicating that the oxide formed under these conditions is electronically defective. The rate of oxidation is reduced if the reaction is carried out in the presence of the radical traps 2,6-di-tert-butyl-4-methylphenol (butylated hydroxytoluene, BHT) or cumene. In addition, photoluminescence intensity is preserved if the DMSO oxidation reaction is carried out in the presence of high concentrations of BHT. The BHT is proposed to form a more electronically passive oxide layer by hydrogenating the surface radicals (dangling bonds) generated during the oxidation reaction.

  5. Optical absorption enhancement in 3D silicon oxide nano-sandwich type solar cell.

    PubMed

    Kiani, Amirkianoosh; Venkatakrishnan, Krishnan; Tan, Bo

    2014-01-13

    Recent research in the field of photovoltaic and solar cell fabrication has shown the potential to significantly enhance light absorption in thin-film solar cells by using surface texturing and nanostructure coating techniques. In this paper, for the first time, we propose a new method for nano sandwich type thin-film solar cell fabrication by combining the laser amorphization (2nd solar cell generation) and laser nanofibers generation (3rd solar cell generation) techniques. In this novel technique, the crystalline silicon is irradiated by megahertz frequency femtosecond laser pulses under ambient conditions and the multi-layer of amorphorized silicon and nano fibrous layer are generated in the single-step on top of the silicon substrate. Light spectroscopy results show significant enhancement of light absorption in the generated multi layers solar cells (Silicon Oxide nanofibers / thin-film amorphorized silicon). This method is single step and no additional materials are added and both layers of the amorphorized thin-film silicon and three-dimensional (3D) silicon oxide nanofibrous structures are grown on top of the silicon substrate after laser irradiation. Finally, we suggest how to maximize the light trapping and optical absorption of the generated nanofibers/thin-film cells by optimizing the laser pulse duration. PMID:24921988

  6. The complex interface chemistry of thin-film silicon/zinc oxide solar cell structures.

    PubMed

    Gerlach, D; Wimmer, M; Wilks, R G; Félix, R; Kronast, F; Ruske, F; Bär, M

    2014-12-21

    The interface between solid-phase crystallized phosphorous-doped polycrystalline silicon (poly-Si(n(+))) and aluminum-doped zinc oxide (ZnO:Al) was investigated using spatially resolved photoelectron emission microscopy. We find the accumulation of aluminum in the proximity of the interface. Based on a detailed photoemission line analysis, we also suggest the formation of an interface species. Silicon suboxide and/or dehydrated hemimorphite have been identified as likely candidates. For each scenario a detailed chemical reaction pathway is suggested. The chemical instability of the poly-Si(n(+))/ZnO:Al interface is explained by the fact that SiO2 is more stable than ZnO and/or that H2 is released from the initially deposited a-Si:H during the crystallization process. As a result, Zn (a deep acceptor in silicon) is "liberated" close to the silicon/zinc oxide interface presenting the inherent risk of forming deep defects in the silicon absorber. These could act as recombination centers and thus limit the performance of silicon/zinc oxide based solar cells. Based on this insight some recommendations with respect to solar cell design, material selection, and process parameters are given for further knowledge-based thin-film silicon device optimization. PMID:25363298

  7. Improvement of plasmonic enhancement of quantum dot emission via an intermediate silicon-aluminum oxide interface

    SciTech Connect

    Wing, Waylin J.; Sadeghi, Seyed M. Campbell, Quinn

    2015-01-05

    We studied the emission of quantum dots in the presence of plasmon-metal oxide substrates, which consist of arrays of metallic nanorods embedded in amorphous silicon coated with a nanometer-thin layer of aluminum oxide on the top. We showed that the combined effects of plasmons and the silicon-aluminum oxide interface can lead to significant enhancement of the quantum efficiency of quantum dots. Our results show that such an interface can significantly enhance plasmonic effects of the nanorods via quantum dot-induced exciton-plasmon coupling, leading to partial polarization of the quantum dots' emission.

  8. Nanocalorimetry of bismuth nanoparticles

    NASA Astrophysics Data System (ADS)

    Olson, Eric Ashley

    The properties of nanosized bismuth particles are investigated using a nanocalorimetric technique. A brief description of the experimental method and data analysis procedures is reported. Bismuth nanoparticles are found to melt at a temperature below that of bulk material, but higher than expected using the standard model. Also included is the results of a finite element analysis and simulated melting of bismuth films on various kinds of sensors. Temperature distributions are found to be nonuniform for calorimetric sensors with Al metallizations, but much more uniform for Pt metallized sensors. The consequences of this nonuniformity on caloric data are discussed.

  9. Evaluation of transition metal oxide as carrier-selective contacts for silicon heterojunction solar cells

    SciTech Connect

    Ding, L.; Boccard, Matthieu; Holman, Zachary; Bertoni, M.

    2015-04-06

    "Reducing light absorption in the non-active solar cell layers, while enabling the extraction of the photogenerated minority carriers at quasi-Fermi levels are two key factors to improve current generation and voltage, and therefore efficiency of silicon heterojunction solar devices. To address these two critical aspects, transition metal oxide materials have been proposed as alternative to the n- and p-type amorphous silicon used as electron and hole selective contacts, respectively. Indeed, transition metal oxides such as molybdenum oxide, titanium oxide, nickel oxide or tungsten oxide combine a wide band gap typically over 3 eV with a band structure and theoretical band alignment with silicon that results in high transparency to the solar spectrum and in selectivity for the transport of only one carrier type. Improving carrier extraction or injection using transition metal oxide has been a topic of investigation in the field of organic solar cells and organic LEDs; from these pioneering works a lot of knowledge has been gained on materials properties, ways to control these during synthesis and deposition, and their impact on device performance. Recently, the transfer of some of this knowledge to silicon solar cells and the successful application of some metal oxide to contact heterojunction devices have gained much attention. In this contribution, we investigate the suitability of various transition metal oxide films (molybdenum oxide, titanium oxide, and tungsten oxide) deposited either by thermal evaporation or sputtering as transparent hole or electron selective transport layer for silicon solar cells. In addition to systematically characterize their optical and structural properties, we use photoemission spectroscopy to relate compound stoichiometry to band structure and characterize band alignment to silicon. The direct silicon/metal oxide interface is further analyzed by quasi-steady state photoconductance decay method to assess the quality of surface

  10. Hybrid Integration of Graphene Analog and Silicon Complementary Metal-Oxide-Semiconductor Digital Circuits.

    PubMed

    Hong, Seul Ki; Kim, Choong Sun; Hwang, Wan Sik; Cho, Byung Jin

    2016-07-26

    We demonstrate a hybrid integration of a graphene-based analog circuit and a silicon-based digital circuit in order to exploit the strengths of both graphene and silicon devices. This mixed signal circuit integration was achieved using a three-dimensional (3-D) integration technique where a graphene FET multimode phase shifter is fabricated on top of a silicon complementary metal-oxide-semiconductor field-effect transistor (CMOS FET) ring oscillator. The process integration scheme presented here is compatible with the conventional silicon CMOS process, and thus the graphene circuit can successfully be integrated on current semiconductor technology platforms for various applications. This 3-D integration technique allows us to take advantage of graphene's excellent inherent properties and the maturity of current silicon CMOS technology for future electronics. PMID:27403730

  11. Preparation of highly aligned silicon oxide nanowires with stable intensive photoluminescence

    NASA Astrophysics Data System (ADS)

    Duraia, El-Shazly M.; Mansurov, Z. A.; Tokmolden, S.; Beall, Gary W.

    2010-02-01

    In this work we report the successful formation of highly aligned vertical silicon oxide nanowires. The source of silicon was from the substrate itself without any additional source of silicon. X-ray measurement demonstrated that our nanowires are amorphous. Photoluminescence measurements were conducted through 18 months and indicated that there is a very good intensive emission peaks near the violet regions. The FTIR measurements indicated the existence of peaks at 463, 604, 795 and a wide peak at 1111 cm -1 and this can be attributed to Si-O-Si and Si-O stretching vibrations. We also report the formation of the octopus-like silicon oxide nanowires and the growth mechanism of these structures was discussed.

  12. Rapid Covalent Modification of Silicon Oxide Surfaces through Microwave-Assisted Reactions with Alcohols.

    PubMed

    Lee, Austin W H; Gates, Byron D

    2016-07-26

    We demonstrate the method of a rapid covalent modification of silicon oxide surfaces with alcohol-containing compounds with assistance by microwave reactions. Alcohol-containing compounds are prevalent reagents in the laboratory, which are also relatively easy to handle because of their stability against exposure to atmospheric moisture. The condensation of these alcohols with the surfaces of silicon oxides is often hindered by slow reaction kinetics. Microwave radiation effectively accelerates this condensation reaction by heating the substrates and/or solvents. A variety of substrates were modified in this demonstration, such as silicon oxide films of various thicknesses, glass substrates such as microscope slides (soda lime), and quartz. The monolayers prepared through this strategy demonstrated the successful formation of covalent surface modifications of silicon oxides with water contact angles of up to 110° and typical hysteresis values of 2° or less. An evaluation of the hydrolytic stability of these monolayers demonstrated their excellent stability under acidic conditions. The techniques introduced in this article were successfully applied to tune the surface chemistry of silicon oxides to achieve hydrophobic, oleophobic, and/or charged surfaces. PMID:27396288

  13. Synthesis of metal silicide at metal/silicon oxide interface by electronic excitation

    SciTech Connect

    Lee, J.-G.; Nagase, T.; Yasuda, H.; Mori, H.

    2015-05-21

    The synthesis of metal silicide at the metal/silicon oxide interface by electronic excitation was investigated using transmission electron microscopy. A platinum silicide, α-Pt{sub 2}Si, was successfully formed at the platinum/silicon oxide interface under 25–200 keV electron irradiation. This is of interest since any platinum silicide was not formed at the platinum/silicon oxide interface by simple thermal annealing under no-electron-irradiation conditions. From the electron energy dependence of the cross section for the initiation of the silicide formation, it is clarified that the silicide formation under electron irradiation was not due to a knock-on atom-displacement process, but a process induced by electronic excitation. It is suggested that a mechanism related to the Knotek and Feibelman mechanism may play an important role in silicide formation within the solid. Similar silicide formation was also observed at the palladium/silicon oxide and nickel/silicon oxide interfaces, indicating a wide generality of the silicide formation by electronic excitation.

  14. Rapid Covalent Modification of Silicon Oxide Surfaces through Microwave-Assisted Reactions with Alcohols.

    PubMed

    Lee, Austin W H; Gates, Byron D

    2016-07-26

    We demonstrate the method of a rapid covalent modification of silicon oxide surfaces with alcohol-containing compounds with assistance by microwave reactions. Alcohol-containing compounds are prevalent reagents in the laboratory, which are also relatively easy to handle because of their stability against exposure to atmospheric moisture. The condensation of these alcohols with the surfaces of silicon oxides is often hindered by slow reaction kinetics. Microwave radiation effectively accelerates this condensation reaction by heating the substrates and/or solvents. A variety of substrates were modified in this demonstration, such as silicon oxide films of various thicknesses, glass substrates such as microscope slides (soda lime), and quartz. The monolayers prepared through this strategy demonstrated the successful formation of covalent surface modifications of silicon oxides with water contact angles of up to 110° and typical hysteresis values of 2° or less. An evaluation of the hydrolytic stability of these monolayers demonstrated their excellent stability under acidic conditions. The techniques introduced in this article were successfully applied to tune the surface chemistry of silicon oxides to achieve hydrophobic, oleophobic, and/or charged surfaces.

  15. Crack healing behavior of hot pressed silicon nitride due to oxidation

    NASA Technical Reports Server (NTRS)

    Choi, S. R.; Tikare, V.

    1992-01-01

    It is shown that limited oxidation of an MgO-containing, hot-pressed silicon nitride ceramic at 800 deg C and above results in increased strength due to crack healing. Slight oxidation of the surface produces enstatite and cristobalite which fills in cracks. More extensive oxidation leads to strength degradation due to the formation of new flaws by the evolution of N2 gas at the surface. The apparent fracture toughness also increased at 800 deg C and above due to oxidation. Bonds formed between the two surfaces of the crack during oxidation leads to a reduction in stress intensity at the crack tip, suggesting that valid high-temperature toughness values cannot be obtained in an air environment. The increase in strength due to crack healing by oxidation can be achieved without compromising the fatigue properties of the silicon nitride ceramic.

  16. Bismuth - modified supported catalysts

    SciTech Connect

    Nadirov, N.K.; Lykova, L.F.; Petrosyan, L.S.

    1985-09-01

    Bismuth was used as an additive to three-component catalysts prepared through modification of an aluminoplatinorhenium catalyst by III and IV nontransition and iron subgroup elements. Since there is conflicting information on bismuth additions, the role of bismuth in polycomponent catalysts and whether it promotes aromatization catalysts was considered. The effect of temperature on the yield of n-hexane conversion products in the presence of Pt-Re-Co-Bi/gamma-A1/sub 2/O/sub 3/ is shown. Conclusive results establish that the addition of 0.5% nickel to a 0.3 Pt-0.3 Re/gamma-A1/sub 2/O/sub 3/ catalyst (in wt.%) increased the yield of benzene from n-hexane by 5.7%. It was also shown that 0.1 to 0.25 wt.% bismuth poisons two- and three-component samples containing 0.25 to 0.3 wt.% platinum.

  17. Corrosion resistant three-dimensional nanotextured silicon for water photo-oxidation

    NASA Astrophysics Data System (ADS)

    Carter, Rachel; Chatterjee, Shahana; Gordon, Evan; Share, Keith; Erwin, William R.; Cohn, Adam P.; Bardhan, Rizia; Pint, Cary L.

    2015-10-01

    We demonstrate the ability to chemically transform bulk silicon into a nanotextured surface that exhibits excellent electrochemical stability in aqueous conditions for water photo-oxidation. Conformal defective graphene coatings on nanotextured silicon formed by thermal treatment enable over 50× corrosion resistance in aqueous electrolytes based upon Tafel analysis and impedance spectroscopy. This enables nanotextured silicon as an effective oxygen-evolution photoanode for water splitting with saturation current density measured near 35 mA cm-2 under 100 mW cm-2 (1 sun) illumination. Our approach builds upon simple and scalable processing techniques with silicon to develop corrosion resistant electrodes that can benefit a broad range of catalytic and photocatalytic applications.We demonstrate the ability to chemically transform bulk silicon into a nanotextured surface that exhibits excellent electrochemical stability in aqueous conditions for water photo-oxidation. Conformal defective graphene coatings on nanotextured silicon formed by thermal treatment enable over 50× corrosion resistance in aqueous electrolytes based upon Tafel analysis and impedance spectroscopy. This enables nanotextured silicon as an effective oxygen-evolution photoanode for water splitting with saturation current density measured near 35 mA cm-2 under 100 mW cm-2 (1 sun) illumination. Our approach builds upon simple and scalable processing techniques with silicon to develop corrosion resistant electrodes that can benefit a broad range of catalytic and photocatalytic applications. Electronic supplementary information (ESI) available: (i) Experimental details, (ii) Nyquist plot from EIS data, (iii) FTIR of H-terminated silicon, (iv) reflectance measurements to quantify light trapping in nanotextured silicon, (v) LSV from Tafel analysis, and (vi) J-V curves for H-terminated flat samples, (vii) stability test of photoanode, and (viii) forward and reverse scans for each sample type. See DOI: 10

  18. Optimization of contaminated oxide inversion layer solar cell. [considering silicon oxide coating

    NASA Technical Reports Server (NTRS)

    Call, R. L.

    1976-01-01

    Contaminated oxide cells have been fabricated with efficiencies of 8.6% with values of I sub sc = 120 ma, V sub oc = .54 volts, and curve factor of .73. Attempts to optimize the fabrication step to yield a higher output have not been successful. The fundamental limitation is the inadequate antireflection coating afforded by the silicon dioxide coating used to hold the contaminating ions. Coatings of SiO, therefore, were used to obtain a good antireflection coating, but the thinness of the coatings prevented a large concentration of the contaminating ions, and the cells was weak. Data of the best cell were .52 volts V sub oc, 110 ma I sub sc, .66 CFF and 6.7% efficiency.

  19. Dispersion engineering of high-Q silicon microresonators via thermal oxidation

    SciTech Connect

    Jiang, Wei C.; Zhang, Jidong; Usechak, Nicholas G.; Lin, Qiang

    2014-07-21

    We propose and demonstrate a convenient and sensitive technique for precise engineering of group-velocity dispersion in high-Q silicon microresonators. By accurately controlling the surface-oxidation thickness of silicon microdisk resonators, we are able to precisely manage the zero-dispersion wavelength, while simultaneously further improving the high optical quality of our devices, with the optical Q close to a million. The demonstrated dispersion management allows us to achieve parametric generation with precisely engineerable emission wavelengths, which shows great potential for application in integrated silicon nonlinear and quantum photonics.

  20. The effect of nanocrystalline silicon host on magnetic properties of encapsulated iron oxide nanoparticles.

    PubMed

    Granitzer, P; Rumpf, K; Gonzalez-Rodriguez, R; Coffer, J L; Reissner, M

    2015-12-21

    The purpose of this work is a detailed comparison of the fundamental magnetic properties of nanocomposite systems consisting of Fe3O4 nanoparticle-loaded porous silicon as well as silicon nanotubes. Such composite structures are of potential merit in the area of magnetically guided drug delivery. For magnetic systems to be utilized in biomedical applications, there are certain magnetic properties that must be fulfilled. Therefore magnetic properties of embedded Fe3O4-nanoparticles in these nanostructured silicon host matrices, porous silicon and silicon nanotubes, are investigated. Temperature-dependent magnetic investigations have been carried out for four types of iron oxide particle sizes (4, 5, 8 and 10 nm). The silicon host, in interplay with the iron oxide nanoparticle size, plays a sensitive role. It is shown that Fe3O4 loaded porous silicon and SiNTs differ significantly in their magnetic behavior, especially the transition between superparamagnetic behavior and blocked state, due to host morphology-dependent magnetic interactions. Importantly, it is found that all investigated samples meet the magnetic precondition of possible biomedical applications of exhibiting a negligible magnetic remanence at room temperature.

  1. Quantification of silane molecules on oxidized silicon: are there options for a traceable and absolute determination?

    PubMed

    Dietrich, P M; Streeck, C; Glamsch, S; Ehlert, C; Lippitz, A; Nutsch, A; Kulak, N; Beckhoff, B; Unger, W E S

    2015-10-01

    Organosilanes are used routinely to functionalize various support materials for further modifications. Nevertheless, reliable quantitative information about surface functional group densities after layer formation is rarely available. Here, we present the analysis of thin organic nanolayers made from nitrogen containing silane molecules on naturally oxidized silicon wafers with reference-free total reflection X-ray fluorescence (TXRF) and X-ray photoelectron spectroscopy (XPS). An areic density of 2-4 silane molecules per nm(2) was calculated from the layer's nitrogen mass deposition per area unit obtained by reference-free TXRF. Complementary energy and angle-resolved XPS (ER/AR-XPS) in the Si 2p core-level region was used to analyze the outermost surface region of the organic (silane layer)-inorganic (silicon wafer) interface. Different coexisting silicon species as silicon, native silicon oxide, and silane were identified and quantified. As a result of the presented proof-of-concept, absolute and traceable values for the areic density of silanes containing nitrogen as intrinsic marker are obtained by calibration of the XPS methods with reference-free TXRF. Furthermore, ER/AR-XPS is shown to facilitate the determination of areic densities in (mono)layers made from silanes having no heteroatomic marker other than silicon. After calibration with reference-free TXRF, these areic densities of silane molecules can be determined when using the XPS component intensity of the silane's silicon atom.

  2. Optical properties of bismuth-doped silica fibres in the temperature range 300 - 1500 K

    SciTech Connect

    Dvoretskii, D A; Bufetov, Igor' A; Vel'miskin, V V; Zlenko, Alexander S; Khopin, V F; Semjonov, S L; Guryanov, Aleksei N; Denisov, L K; Dianov, Evgenii M

    2012-09-30

    The visible and near-IR absorption and luminescence bands of bismuth-doped silica and germanosilicate fibres have been measured for the first time as a function of temperature. The temperature-dependent IR luminescence lifetime of a bismuth-related active centre associated with silicon in the germanosilicate fibre has been determined. The Bi{sup 3+} profile across the silica fibre preform is shown to differ markedly from the distribution of IR-emitting bismuth centres associated with silicon. The present results strongly suggest that the IR-emitting bismuth centre comprises a lowvalence bismuth ion and an oxygen-deficient glass network defect. (optical fibres, lasers and amplifiers. properties and applications)

  3. Antimony promoted bismuth cerium molybdate catalysts

    SciTech Connect

    Brazdil, J.F.; Glaeser, L.C.; Grasselli, R.K.

    1990-05-01

    This patent describes an improvement in antimony-promoted bismuth cerium molybdate whereby the tendency of the catalyst to lose efectiveness over time is significantly reduced. This patent describes new catalysts which are also useful in other oxidation-type reactions such as the oxidation of acrolein and methacrolein to produce the corresponding unsaturated aldehydes and acids and the oxydehydrogenation of various olefins such as isoamylenes to produce the corresponding diolefins such as isoprene.

  4. Optical properties of bismuth borate glasses

    NASA Astrophysics Data System (ADS)

    Oprea, Isabella-Ioana; Hesse, Hartmut; Betzler, Klaus

    2004-08-01

    Optical properties of glasses in the binary system bismuth oxide (Bi 2O 3)-boric oxide (B 2O 3) are measured for the composition range 25-65 mol% Bi 2O 3. Both, refractive indices and ultraviolet absorption edge, show an expressed dependence on composition. A generalized Sellmeier formula is derived to describe the refractive indices for the whole composition range and a wide wavelength range.

  5. Designing high performance precursors for atomic layer deposition of silicon oxide

    SciTech Connect

    Mallikarjunan, Anupama Chandra, Haripin; Xiao, Manchao; Lei, Xinjian; Pearlstein, Ronald M.; Bowen, Heather R.; O'Neill, Mark L.; Derecskei-Kovacs, Agnes; Han, Bing

    2015-01-15

    Conformal and continuous silicon oxide films produced by atomic layer deposition (ALD) are enabling novel processing schemes and integrated device structures. The increasing drive toward lower temperature processing requires new precursors with even higher reactivity. The aminosilane family of precursors has advantages due to their reactive nature and relative ease of use. In this paper, the authors present the experimental results that reveal the uniqueness of the monoaminosilane structure [(R{sub 2}N)SiH{sub 3}] in providing ultralow temperature silicon oxide depositions. Disubstituted aminosilanes with primary amines such as in bis(t-butylamino)silane and with secondary amines such as in bis(diethylamino)silane were compared with a representative monoaminosilane: di-sec-butylaminosilane (DSBAS). DSBAS showed the highest growth per cycle in both thermal and plasma enhanced ALD. These findings show the importance of the arrangement of the precursor's organic groups in an ALD silicon oxide process.

  6. Silicon Oxide Deposition into a Hole Using a Focused Ion Beam

    NASA Astrophysics Data System (ADS)

    Nakamura, Hiroko; Komano, Haruki; Norimatu, Kenji; Gomei, Yoshio

    1991-11-01

    Focused ion beam (FIB)-induced deposition of silicon oxide in terms of filling a hole is reported. It was found that a vacant space was formed when an ion beam was simply scanned through the hole area. To investigate the mechanism to form the vacancy, deposition on the sample, which has a step with a height of 0.8 μm, was carried out by using a Si2+ and a Be2+ ion beam. An extruded deposit resembling a pent roof was observed from the step ridge. The mechanism of the pent roof growth on the steplike sample was considered and the vacancy formation in the hole can be explained by the same mechanism. For silicon oxide, the high growth rate of the extruded deposit is thought to be the key to the vacancy formation. A useful way is proposed to fill the hole with silicon oxide with almost no vacancy.

  7. Silicon microlens structures fabricated by scanning-probe gray-scale oxidation.

    PubMed

    Chen, C F; Tzeng, S D; Chen, H Y; Gwo, S

    2005-03-15

    We report on the micromachining of silicon microlens structures by use of scanning-probe gray-scale anodic oxidation along with dry anisotropic etching. Convex, concave, and arbitrarily shaped silicon microlenses with diameters as small as 2 microm are demonstrated. We also confirm the high fidelity of pattern transfer between the probe-induced oxides and the etched silicon microlens structures. Besides the flexibility, the important features of scanning-probe gray-scale anodic oxidation are small pixel size and pitch (of the order of tens of nanometers), an unlimited number of gray-scale levels, and the possibility of creating arbitrarily designed microlens structures with exquisite precision and resolution. With this approach, refractive, diffractive, and hybrid microlens arrays can be developed to create innovative optical components.

  8. Titanium-silicon oxide film structures for polarization-modulated infrared reflection absorption spectroscopy

    PubMed Central

    Dunlop, Iain E.; Zorn, Stefan; Richter, Gunther; Srot, Vesna; Kelsch, Marion; van Aken, Peter A.; Skoda, Maximilian; Gerlach, Alexander; Spatz, Joachim P.; Schreiber, Frank

    2010-01-01

    We present a titanium-silicon oxide film structure that permits polarization modulated infrared reflection absorption spectroscopy on silicon oxide surfaces. The structure consists of a ~6 nm sputtered silicon oxide film on a ~200 nm sputtered titanium film. Characterization using conventional and scanning transmission electron microscopy, electron energy loss spectroscopy, X-ray photoelectron spectroscopy and X-ray reflectometry is presented. We demonstrate the use of this structure to investigate a selectively protein-resistant self-assembled monolayer (SAM) consisting of silane-anchored, biotin-terminated poly(ethylene glycol) (PEG). PEG-associated IR bands were observed. Measurements of protein-characteristic band intensities showed that this SAM adsorbed streptavidin whereas it repelled bovine serum albumin, as had been expected from its structure. PMID:20418963

  9. Microstructural and physical properties of magnesium oxide-doped silicon nitride ceramics

    NASA Astrophysics Data System (ADS)

    Sirota, V.; Lukianova, O.; Krasilnikov, V.; Selemenev, V.; Dokalov, V.

    Silicon nitride based ceramics with aluminum, yttrium and magnesium oxides were produced by cold isostatic pressing and free sintering. The phase composition of the starting MgO powder obtained by the novel technology has been studied. The effect of magnesium oxide content on the structure of the produced materials has been investigated. It was found, that obtained materials with 1 and 2 wt.% of magnesium oxide and without it have a typical β-silicon nitride structure with elongated grains. Ceramics with 5 wt.% magnesia has a duplex α/β-structure with elongated and equiaxed grains. Ceramics with 2 wt.% magnesium oxide has a maximum density of 2.91 g/cm3. The increases in magnesium oxide content upto 5% led to decrease in the shrinkage (from 16% to 12%) and density (from 2.88 to 2.37 g/cm3).

  10. Resistance of Silicon Nitride Turbine Components to Erosion and Hot Corrosion/oxidation Attack

    NASA Technical Reports Server (NTRS)

    Strangmen, Thomas E.; Fox, Dennis S.

    1994-01-01

    Silicon nitride turbine components are under intensive development by AlliedSignal to enable a new generation of higher power density auxiliary power systems. In order to be viable in the intended applications, silicon nitride turbine airfoils must be designed for survival in aggressive oxidizing combustion gas environments. Erosive and corrosive damage to ceramic airfoils from ingested sand and sea salt must be avoided. Recent engine test experience demonstrated that NT154 silicon nitride turbine vanes have exceptional resistance to sand erosion, relative to superalloys used in production engines. Similarly, NT154 silicon nitride has excellent resistance to oxidation in the temperature range of interest - up to 1400 C. Hot corrosion attack of superalloy gas turbine components is well documented. While hot corrosion from ingested sea salt will attack silicon nitride substantially less than the superalloys being replaced in initial engine applications, this degradation has the potential to limit component lives in advanced engine applications. Hot corrosion adversely affects the strength of silicon nitride in the 850 to 1300 C range. Since unacceptable reductions in strength must be rapidly identified and avoided, AlliedSignal and the NASA Lewis Research Center have pioneered the development of an environmental life prediction model for silicon nitride turbine components. Strength retention in flexure specimens following 1 to 3300 hour exposures to high temperature oxidation and hot corrosion has been measured and used to calibrate the life prediction model. Predicted component life is dependent upon engine design (stress, temperature, pressure, fuel/air ratio, gas velocity, and inlet air filtration), mission usage (fuel sulfur content, location (salt in air), and times at duty cycle power points), and material parameters. Preliminary analyses indicate that the hot corrosion resistance of NT154 silicon nitride is adequate for AlliedSignal's initial engine

  11. Fabrication of OSOS cells by neutral ion beam sputtering. [Oxide Semiconductor On Silicon solar cells

    NASA Technical Reports Server (NTRS)

    Burk, D. E.; Dubow, J. B.; Sites, J. R.

    1976-01-01

    Oxide semiconductor on silicon (OSOS) solar cells have been fabricated from various indium tin oxide (In2O3)x(SnO2)1-x compositions sputtered onto p-type single crystal silicon substrates with a neutralized argon ion beam. High temperature processing or annealing was not required. The highest efficiency was achieved with x = 0.91 and was 12 percent. The cells are environmentally rugged, chemically stable, and show promise for still higher efficiencies. Moreover, the ion beam sputtering fabrication technique is amenable to low cost, continuous processing.

  12. High-Quality Solution-Processed Silicon Oxide Gate Dielectric Applied on Indium Oxide Based Thin-Film Transistors.

    PubMed

    Jaehnike, Felix; Pham, Duy Vu; Anselmann, Ralf; Bock, Claudia; Kunze, Ulrich

    2015-07-01

    A silicon oxide gate dielectric was synthesized by a facile sol-gel reaction and applied to solution-processed indium oxide based thin-film transistors (TFTs). The SiOx sol-gel was spin-coated on highly doped silicon substrates and converted to a dense dielectric film with a smooth surface at a maximum processing temperature of T = 350 °C. The synthesis was systematically improved, so that the solution-processed silicon oxide finally achieved comparable break downfield strength (7 MV/cm) and leakage current densities (<10 nA/cm(2) at 1 MV/cm) to thermally grown silicon dioxide (SiO2). The good quality of the dielectric layer was successfully proven in bottom-gate, bottom-contact metal oxide TFTs and compared to reference TFTs with thermally grown SiO2. Both transistor types have field-effect mobility values as high as 28 cm(2)/(Vs) with an on/off current ratio of 10(8), subthreshold swings of 0.30 and 0.37 V/dec, respectively, and a threshold voltage close to zero. The good device performance could be attributed to the smooth dielectric/semiconductor interface and low interface trap density. Thus, the sol-gel-derived SiO2 is a promising candidate for a high-quality dielectric layer on many substrates and high-performance large-area applications. PMID:26039187

  13. Bismuth as a modifier of Au Pd catalyst: Enhancing selectivity in alcohol oxidation by suppressing parallel reaction

    SciTech Connect

    Villa, Alberto; Wang, Di; Veith, Gabriel M; Prati, Laura

    2012-01-01

    Bi has been widely employed as a modifier for Pd and Pt based catalyst mainly in order to improve selectivity. We found that when Bi was added to the bimetallic system AuPd, the effect on activity in alcohol oxidation mainly depends on the amount of Bi regardless its position, being negligible when Bi was 0.1 wt% and detectably negative when the amount was increased to 3 wt%. However, the selectivity of the reactions notably varied only when Bi was deposited on the surface of metal nanoparticles suppressing parallel reaction in both benzyl alcohol and glycerol oxidation. After a careful characterization of all the catalysts and additional catalytic tests, we concluded that the Bi influence on the activity of the catalysts could be ascribed to electronic effect whereas the one on selectivity mainly to a geometric modification. Moreover, the Bi-modified AuPd/AC catalyst showed possible application in the production of tartronic acid, a useful intermediate, from glycerol.

  14. Plasma-Sprayed Refractory Oxide Coatings on Silicon-Base Ceramics

    NASA Technical Reports Server (NTRS)

    Tewari, Surendra

    1997-01-01

    Silicon-base ceramics are promising candidate materials for high temperature structural applications such as heat exchangers, gas turbines and advanced internal combustion engines. Composites based on these materials are leading candidates for combustor materials for HSCT gas turbine engines. These materials possess a combination of excellent physical and mechanical properties at high temperatures, for example, high strength, high toughness, high thermal shock resistance, high thermal conductivity, light weight and excellent oxidation resistance. However, environmental durability can be significantly reduced in certain conditions such as when molten salts, H2 or water vapor are present. The oxidation resistance of silicon-base materials is provided by SiO2 protective layer. Molten salt reacts with SiO2 and forms a mixture of SiO2 and liquid silicate at temperatures above 800C. Oxygen diffuses more easily through the chemically altered layer, resulting in a catastrophic degradation of the substrate. SiC and Si3N4 are not stable in pure H2 and decompose to silicon and gaseous species such as CH4, SiH, SiH4, N2, and NH3. Water vapor is known to slightly increase the oxidation rate of SiC and Si3N4. Refractory oxides such as alumina, yttria-stabilized zirconia, yttria and mullite (3Al2O3.2SiO2) possess excellent environmental durability in harsh conditions mentioned above. Therefore, refractory oxide coatings on silicon-base ceramics can substantially improve the environmental durability of these materials by acting as a chemical reaction barrier. These oxide coatings can also serve as a thermal barrier. The purpose of this research program has been to develop refractory oxide chemical/thermal barrier coatings on silicon-base ceramics to provide extended temperature range and lifetime to these materials in harsh environments.

  15. Role of an Oxidant Mixture as Surface Modifier of Porous Silicon Microstructures Evaluated by Spectroscopic Ellipsometry.

    PubMed

    Montiel-González, Zeuz; Escobar, Salvador; Nava, Rocío; del Río, J Antonio; Tagüeña-Martínez, Julia

    2016-04-21

    Current research on porous silicon includes the construction of complex structures with luminescent and/or photonic properties. However, their preparation with both characteristics is still challenging. Recently, our group reported a possible method to achieve that by adding an oxidant mixture to the electrolyte used to produce porous silicon. This mixture can chemically modify their microstructure by changing the thickness and surface passivation of the pore walls. In this work, we prepared a series of samples (with and without oxidant mixture) and we evaluated the structural differences through their scanning electron micrographs and their optical properties determined by spectroscopic ellipsometry. The results showed that ellipsometry is sensitive to slight variations in the porous silicon structure, caused by changes in their preparation. The fitting process, based on models constructed from the features observed in the micrographs, allowed us to see that the mayor effect of the oxidant mixture is on samples of high porosity, where the surface oxidation strongly contributes to the skeleton thinning during the electrochemical etching. This suggests the existence of a porosity threshold for the action of the oxidant mixture. These results could have a significant impact on the design of complex porous silicon structures for different optoelectronic applications.

  16. Role of an Oxidant Mixture as Surface Modifier of Porous Silicon Microstructures Evaluated by Spectroscopic Ellipsometry

    PubMed Central

    Montiel-González, Zeuz; Escobar, Salvador; Nava, Rocío; del Río, J. Antonio; Tagüeña-Martínez, Julia

    2016-01-01

    Current research on porous silicon includes the construction of complex structures with luminescent and/or photonic properties. However, their preparation with both characteristics is still challenging. Recently, our group reported a possible method to achieve that by adding an oxidant mixture to the electrolyte used to produce porous silicon. This mixture can chemically modify their microstructure by changing the thickness and surface passivation of the pore walls. In this work, we prepared a series of samples (with and without oxidant mixture) and we evaluated the structural differences through their scanning electron micrographs and their optical properties determined by spectroscopic ellipsometry. The results showed that ellipsometry is sensitive to slight variations in the porous silicon structure, caused by changes in their preparation. The fitting process, based on models constructed from the features observed in the micrographs, allowed us to see that the mayor effect of the oxidant mixture is on samples of high porosity, where the surface oxidation strongly contributes to the skeleton thinning during the electrochemical etching. This suggests the existence of a porosity threshold for the action of the oxidant mixture. These results could have a significant impact on the design of complex porous silicon structures for different optoelectronic applications. PMID:27097767

  17. Low-index nanopatterned barrier for hybrid oxide-free III-V silicon conductive bonding.

    PubMed

    Bougot-Robin, Kristelle; Talneau, Anne; Benisty, Henri

    2014-09-22

    Oxide-free bonding of a III-V active stack emitting at 1300-1600 nm to a silicon-on-insulator wafer offers the capability to electrically inject lasers from the silicon side. However, a typical 500-nm-thick silicon layer notably attracts the fundamental guided mode of the silicon + III-V stack, a detrimental feature compared to established III-V Separate-Confinement Heterostructure (SCH) stacks. We experimentally probe with photoluminescence as an internal light source the guiding behavior for oxide-free bonding to a nanopatterned silicon wafer that acts as a low-index barrier. We use a sub-wavelength square array of small holes as an effective "low-index silicon" medium. It is weakly modulated along one dimension (superperiodic array) to outcouple the resulting guided modes to free space, where we use an angle-resolved spectroscopy study. Analysis of experimental branches confirms the capability to operate with a fundamental mode well localized in the III-V heterostructures.

  18. Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride.

    PubMed

    Kischkat, Jan; Peters, Sven; Gruska, Bernd; Semtsiv, Mykhaylo; Chashnikova, Mikaela; Klinkmüller, Matthias; Fedosenko, Oliana; Machulik, Stephan; Aleksandrova, Anna; Monastyrskyi, Gregorii; Flores, Yuri; Masselink, W Ted

    2012-10-01

    The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54-14.29 μm (700-6500 cm(-1)). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design.

  19. Oxidation of Chemically-Vapor-Deposited Silicon Carbide in Carbon Dioxide

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.; Nguyen, QuynhGiao N.

    1998-01-01

    Chemically-vapor-deposited silicon carbide (CVD SiC) was oxidized in carbon dioxide (CO2) at temperatures of 1200-1400 C for times between 96 and 500 h at several gas flow rates. Oxidation weight gains were monitored by thermogravimetric analysis (TGA) and were found to be very small and independent of temperature. Possible rate limiting kinetic mechanisms are discussed. Passive oxidation of SiC by CO2 is negligible compared to the rates measured for other oxidants that are also found in combustion environments, oxygen and water vapor.

  20. Heterojunction Solar Cells Based on Silicon and Composite Films of Graphene Oxide and Carbon Nanotubes.

    PubMed

    Yu, LePing; Tune, Daniel; Shearer, Cameron; Shapter, Joseph

    2015-09-01

    Graphene oxide (GO) sheets have been used as the surfactant to disperse single-walled carbon nanotubes (CNT) in water to prepare GO/CNT electrodes that are applied to silicon to form a heterojunction that can be used in solar cells. GO/CNT films with different ratios of the two components and with various thicknesses have been used as semitransparent electrodes, and the influence of both factors on the performance of the solar cell has been studied. The degradation rate of the GO/CNT-silicon devices under ambient conditions has also been explored. The influence of the film thickness on the device performance is related to the interplay of two competing factors, namely, sheet resistance and transmittance. CNTs help to improve the conductivity of the GO/CNT film, and GO is able to protect the silicon from oxidation in the atmosphere.

  1. Microstructure, oxidation behavior and mechanical behavior of lens deposited niobium-titanium-silicon and niobium-titanium-silicon based alloys

    NASA Astrophysics Data System (ADS)

    Dehoff, Ryan Richard

    With current high temperature structural materials such as nickel based superalloys being pushed to the limits of suitable operating conditions, there comes a need for replacement materials with even higher temperature capabilities. Niobium silicon based systems have been shown to have superior density normalized strength at elevated temperatures when compared to currently used alloys. The drawbacks associated with the niobium silicon system are due to catastrophic oxidation behavior at elevated temperatures. Alloying addition have been shown to increase the oxidation resistance near suitable levels, but also decrease the high temperature strength and increases creep rates when compared to the binary alloy system. The microstructure of the material is similar to metal matrix composites in which high melting temperature silicides are dispersed in a niobium based matrix phase. The silicides produce high temperature strength while the niobium based matrix increases the room temperature properties such as fracture toughness. The bulk of the research has been conducted on directionally solidified material which has a coarse microstructure due to the slow cooling rates associated with the processing condition. The current research uses a powder metallurgy process termed Laser Engineered Net Shaping, or LENS, to produce material with a significantly refined microstructure due to fast cooling rates associated with the laser process. Several compositions of alloys were examined and the ideal processing parameters were determined for each alloy. The resulting microstructures show a refinement of the microstructure as expected with a fine scale distribution of Nb5Si3 and Nb3Si dispersed in a niobium based matrix phase. The high temperature oxidation behavior of the LENS deposited alloys was comparable to alloys produced using other techniques. A non protective oxide scale formed on samples exposed for only 0.5 hours but was not protective and showed large amounts of

  2. Silicon oxide nanowire growth mechanisms revealed by real-time electron microscopy

    NASA Astrophysics Data System (ADS)

    Kolíbal, Miroslav; Novák, Libor; Shanley, Toby; Toth, Milos; Šikola, Tomáš

    2015-12-01

    Growth of one-dimensional materials is possible through numerous mechanisms that affect the nanowire structure and morphology. Here, we explain why a wide range of morphologies is observed when silicon oxide nanowires are grown on silicon substrates using liquid gallium catalyst droplets. We show that a gallium oxide overlayer is needed for nanowire nucleation at typical growth temperatures, and that it can decompose during growth and, hence, dramatically alter the nanowire morphology. Gallium oxide decomposition is attributed to etching caused by hydrogen that can be supplied by thermal dissociation of H2O (a common impurity). We show that H2O dissociation is catalyzed by silicon substrates at temperatures as low as 320 °C, identify the material supply pathways and processes that rate-limit nanowire growth under dry and wet atmospheres, and present a detailed growth model that explains contradictory results reported in prior studies. We also show that under wet atmospheres the Ga droplets can be mobile and promote nanowire growth as they traverse the silicon substrate.Growth of one-dimensional materials is possible through numerous mechanisms that affect the nanowire structure and morphology. Here, we explain why a wide range of morphologies is observed when silicon oxide nanowires are grown on silicon substrates using liquid gallium catalyst droplets. We show that a gallium oxide overlayer is needed for nanowire nucleation at typical growth temperatures, and that it can decompose during growth and, hence, dramatically alter the nanowire morphology. Gallium oxide decomposition is attributed to etching caused by hydrogen that can be supplied by thermal dissociation of H2O (a common impurity). We show that H2O dissociation is catalyzed by silicon substrates at temperatures as low as 320 °C, identify the material supply pathways and processes that rate-limit nanowire growth under dry and wet atmospheres, and present a detailed growth model that explains

  3. Microcrystalline silicon oxides for silicon-based solar cells: impact of the O/Si ratio on the electronic structure

    NASA Astrophysics Data System (ADS)

    Bär, M.; Starr, D. E.; Lambertz, A.; Holländer, B.; Alsmeier, J.-H.; Weinhardt, L.; Blum, M.; Gorgoi, M.; Yang, W.; Wilks, R. G.; Heske, C.

    2014-10-01

    Hydrogenated microcrystalline silicon oxide (μc-SiOx:H) layers are one alternative approach to ensure sufficient interlayer charge transport while maintaining high transparency and good passivation in Si-based solar cells. We have used a combination of complementary x-ray and electron spectroscopies to study the chemical and electronic structure of the (μc-SiOx:H) material system. With these techniques, we monitor the transition from a purely Si-based crystalline bonding network to a silicon oxide dominated environment, coinciding with a significant decrease of the material's conductivity. Most Si-based solar cell structures contain emitter/contact/passivation layers. Ideally, these layers fulfill their desired task (i.e., induce a sufficiently high internal electric field, ensure a good electric contact, and passivate the interfaces of the absorber) without absorbing light. Usually this leads to a trade-off in which a higher transparency can only be realized at the expense of the layer's ability to properly fulfill its task. One alternative approach is to use hydrogenated microcrystalline silicon oxide (μc-SiOx:H), a mixture of microcrystalline silicon and amorphous silicon (sub)oxide. The crystalline Si regions allow charge transport, while the oxide matrix maintains a high transparency. To date, it is still unclear how in detail the oxygen content influences the electronic structure of the μc-SiOx:H mixed phase material. To address this question, we have studied the chemical and electronic structure of the μc-SiOx:H (0 <= x = O/Si <=1) system with a combination of complementary x-ray and electron spectroscopies. The different surface sensitivities of the employed techniques help to reduce the impact of surface oxides on the spectral interpretation. For all samples, we find the valence band maximum to be located at a similar energy with respect to the Fermi energy. However, for x > 0.5, we observe a pronounced decrease of Si 3s - Si 3p hybridization in favor

  4. Facile preparation of highly-dispersed cobalt-silicon mixed oxide nanosphere and its catalytic application in cyclohexane selective oxidation

    PubMed Central

    2011-01-01

    Highly dispersed cobalt-silicon mixed oxide [Co-SiO2] nanosphere was successfully prepared with a modified reverse-phase microemulsion method. This material was characterized in detail by X-ray diffraction, transmission electron microscopy, Fourier transform infrared, ultraviolet-visible diffuse reflectance spectra, X-ray absorption spectroscopy near-edge structure, and N2 adsorption-desorption measurements. High valence state cobalt could be easily obtained without calcination, which is fascinating for the catalytic application for its strong oxidation ability. In the selective oxidation of cyclohexane, Co-SiO2 acted as an efficient catalyst, and good activity could be obtained under mild conditions. PMID:22067075

  5. Scalable Preparation of Ternary Hierarchical Silicon Oxide-Nickel-Graphite Composites for Lithium-Ion Batteries.

    PubMed

    Wang, Jing; Bao, Wurigumula; Ma, Lu; Tan, Guoqiang; Su, Yuefeng; Chen, Shi; Wu, Feng; Lu, Jun; Amine, Khalil

    2015-12-01

    Silicon monoxide is a promising anode candidate because of its high theoretical capacity and good cycle performance. To solve the problems associated with this material, including large volume changes during charge-discharge processes, we report a ternary hierarchical silicon oxide-nickel-graphite composite prepared by a facile two-step ball-milling method. The composite consists of nano-Si dispersed silicon oxides embedded in nano-Ni/graphite matrices (Si@SiOx /Ni/graphite). In the composite, crystalline nano-Si particles are generated by the mechanochemical reduction of SiO by ball milling with Ni. These nano-Si dispersed oxides have abundant electrochemical activity and can provide high Li-ion storage capacity. Furthermore, the milled nano-Ni/graphite matrices stick well to active materials and interconnect to form a crosslinked framework, which functions as an electrical highway and a mechanical backbone so that all silicon oxide particles become electrochemically active. Owing to these advanced structural and electrochemical characteristics, the composite enhances the utilization efficiency of SiO, accommodates its large volume expansion upon cycling, and has good ionic and electronic conductivity. The composite electrodes thus exhibit substantial improvements in electrochemical performance. This ternary hierarchical Si@SiOx /Ni/graphite composite is a promising candidate anode material for high-energy lithium-ion batteries. Additionally, the mechanochemical ball-milling method is low cost and easy to reproduce, indicating potential for the commercial production of the composite materials.

  6. Metal Oxide Silicon /MOS/ transistors protected from destructive damage by wire

    NASA Technical Reports Server (NTRS)

    Deboo, G. J.; Devine, E. J.

    1966-01-01

    Loop of flexible, small diameter, nickel wire protects metal oxide silicon /MOS/ transistors from a damaging electrostatic potential. The wire is attached to a music-wire spring, slipped over the MOS transistor case, and released so the spring tensions the wire loop around all the transistor leads, shorting them together. This allows handling without danger of damage.

  7. Scalable Preparation of Ternary Hierarchical Silicon Oxide-Nickel-Graphite Composites for Lithium-Ion Batteries.

    PubMed

    Wang, Jing; Bao, Wurigumula; Ma, Lu; Tan, Guoqiang; Su, Yuefeng; Chen, Shi; Wu, Feng; Lu, Jun; Amine, Khalil

    2015-12-01

    Silicon monoxide is a promising anode candidate because of its high theoretical capacity and good cycle performance. To solve the problems associated with this material, including large volume changes during charge-discharge processes, we report a ternary hierarchical silicon oxide-nickel-graphite composite prepared by a facile two-step ball-milling method. The composite consists of nano-Si dispersed silicon oxides embedded in nano-Ni/graphite matrices (Si@SiOx /Ni/graphite). In the composite, crystalline nano-Si particles are generated by the mechanochemical reduction of SiO by ball milling with Ni. These nano-Si dispersed oxides have abundant electrochemical activity and can provide high Li-ion storage capacity. Furthermore, the milled nano-Ni/graphite matrices stick well to active materials and interconnect to form a crosslinked framework, which functions as an electrical highway and a mechanical backbone so that all silicon oxide particles become electrochemically active. Owing to these advanced structural and electrochemical characteristics, the composite enhances the utilization efficiency of SiO, accommodates its large volume expansion upon cycling, and has good ionic and electronic conductivity. The composite electrodes thus exhibit substantial improvements in electrochemical performance. This ternary hierarchical Si@SiOx /Ni/graphite composite is a promising candidate anode material for high-energy lithium-ion batteries. Additionally, the mechanochemical ball-milling method is low cost and easy to reproduce, indicating potential for the commercial production of the composite materials. PMID:26548901

  8. Improved reaction sintered silicon nitride. [protective coatings to improve oxidation resistance

    NASA Technical Reports Server (NTRS)

    Baumgartner, H. R.

    1978-01-01

    Processing treatments were applied to as-nitrided reaction sintered silicon nitride (RSSN) with the purposes of improving strength after processing to above 350 MN/m2 and improving strength after oxidation exposure. The experimental approaches are divided into three broad classifications: sintering of surface-applied powders; impregnation of solution followed by further thermal processing; and infiltration of molten silicon and subsequent carburization or nitridation of the silicon. The impregnation of RSSN with solutions of aluminum nitrate and zirconyl chloride, followed by heating at 1400-1500 C in a nitrogen atmosphere containing silicon monoxide, improved RSSN strength and oxidation resistance. The room temperature bend strength of RSSN was increased nearly fifty percent above the untreated strength with mean absolute strengths up to 420 MN/m2. Strengths of treated samples that were measured after a 12 hour oxidation exposure in air were up to 90 percent of the original as-nitrided strength, as compared to retained strengths in the range of 35 to 60 percent for untreated RSSN after the same oxidation exposure.

  9. Labyrinth patterns of zinc oxide on porous silicon substrate

    NASA Astrophysics Data System (ADS)

    Martínez, L.; Kumar, Y.; Mayorga, D.; Goswami, N.; Agarwal, V.

    2014-03-01

    The substrate treatment dependent formation of different micro-morphologies of zinc oxide over PS substrate has been reported. Effect of substrate oxidation and annealing has been studied. Changes in the structural properties were seen in the form of labyrinth patterns developed on the surface and were studied with the help of scanning electron microscope (SEM), atomic force microscope (AFM). X-ray diffraction (XRD) along with UV-visible absorption and photoluminescence (PL) spectroscopy were performed for characterizing the zinc oxide film and the hybrid structure. A relatively flat film of nanostructured zinc oxide particles is found to form on the oxidized substrate as compared to the nanostructured labyrinth patterns formed on the un-oxidized substrate with enhanced aspect ratio. Such micromorphologies can be very promising for fabricating highly sensitive gas sensors.

  10. A Model for the Oxidation of Carbon Silicon Carbide Composite Structures

    NASA Technical Reports Server (NTRS)

    Sullivan, Roy M.

    2004-01-01

    A mathematical theory and an accompanying numerical scheme have been developed for predicting the oxidation behavior of carbon silicon carbide (C/SiC) composite structures. The theory is derived from the mechanics of the flow of ideal gases through a porous solid. The result of the theoretical formulation is a set of two coupled nonlinear differential equations written in terms of the oxidant and oxide partial pressures. The differential equations are solved simultaneously to obtain the partial vapor pressures of the oxidant and oxides as a function of the spatial location and time. The local rate of carbon oxidation is determined using the map of the local oxidant partial vapor pressure along with the Arrhenius rate equation. The nonlinear differential equations are cast into matrix equations by applying the Bubnov-Galerkin weighted residual method, allowing for the solution of the differential equations numerically. The numerical method is demonstrated by utilizing the method to model the carbon oxidation and weight loss behavior of C/SiC specimens during thermogravimetric experiments. The numerical method is used to study the physics of carbon oxidation in carbon silicon carbide composites.

  11. Hydrothermal synthesis map of bismuth titanates

    SciTech Connect

    Sardar, Kripasindhu; Walton, Richard I.

    2012-05-15

    The hydrothermal synthesis of four bismuth titanate materials from common bismuth and titanium precursors under hydrothermal conditions is described. Reaction of NaBiO{sub 3}{center_dot}2H{sub 2}O and anatase TiO{sub 2} in concentrated NaOH solution at 240 Degree-Sign C is shown to produce perovskite and sillenite phases Na{sub 0.5}Bi{sub 0.5}TiO{sub 3} and Bi{sub 12}TiO{sub 20}, depending on the ratio of metal precursors used. When KOH solution is used and a 1:1 ratio of the same precursors, a pyrochlore Bi{sub 1.43}Ti{sub 2}O{sub 6}(OH){sub 0.29}(H{sub 2}O){sub 0.66} is formed. The use of a mixture of HNO{sub 3} and NaOH is shown to facilitate the formation of the Aurivillius-type bismuth titanate Bi{sub 4}Ti{sub 3}O{sub 12}. The phases have been isolated separately as phase-pure powders and profile refinement of powder X-ray diffraction data allows comparisons with comparable materials reported in the literature. Analysis of Bi L{sub III}-edge X-ray absorption near edge structure (XANES) spectra of the materials shows the oxidation state of bismuth is +3 in all of the hydrothermally derived products. - Graphical abstract: Use of NaBiO{sub 3}{center_dot}2H{sub 2}O and TiO{sub 2} as reagents under hydrothermal conditions allows the phase-pure preparation of four crystalline bismuth titanate materials. Highlights: Black-Right-Pointing-Pointer NaBiO{sub 3} and TiO{sub 2} under hydrothermal conditions allow formation of bismuth titanates. Black-Right-Pointing-Pointer Synthesis of four distint phases has been mapped. Black-Right-Pointing-Pointer Bi LIII-edge XANES shows Bi is reduced to oxidation state +3 in all materials. Black-Right-Pointing-Pointer A new hydrated bismuth titanate pyrochlore has been isolated.

  12. Influence of interlayer trapping and detrapping mechanisms on the electrical characterization of hafnium oxide/silicon nitride stacks on silicon

    SciTech Connect

    Garcia, H.; Duenas, S.; Castan, H.; Gomez, A.; Bailon, L.; Toledano-Luque, M.; Prado, A. del; Martil, I.; Gonzalez-Diaz, G.

    2008-11-01

    Al/HfO{sub 2}/SiN{sub x}:H/n-Si metal-insulator-semiconductor capacitors have been studied by electrical characterization. Films of silicon nitride were directly grown on n-type silicon substrates by electron cyclotron resonance assisted chemical vapor deposition. Silicon nitride thickness was varied from 3 to 6.6 nm. Afterwards, 12 nm thick hafnium oxide films were deposited by the high-pressure sputtering approach. Interface quality was determined by using current-voltage, capacitance-voltage, deep-level transient spectroscopy (DLTS), conductance transients, and flatband voltage transient techniques. Leakage currents followed the Poole-Frenkel emission model in all cases. According to the simultaneous measurement of the high and low frequency capacitance voltage curves, the interface trap density obtained for all the samples is in the 10{sup 11} cm{sup -2} eV{sup -1} range. However, a significant increase in this density of about two orders of magnitude was obtained by DLTS for the thinnest silicon nitride interfacial layers. In this work we probe that this increase is an artifact that must be attributed to traps existing at the HfO{sub 2}/SiN{sub x}:H intralayer interface. These traps are more easily charged or discharged as this interface comes near to the substrate, that is, as thinner the SiN{sub x}:H interface layer is. The trapping/detrapping mechanism increases the capacitance transient and, in consequence, the DLTS measurements have contributions not only from the insulator/substrate interface but also from the HfO{sub 2}/SiN{sub x}:H intralayer interface.

  13. Fabrication of disposable topographic silicon oxide from sawtoothed patterns: control of arrays of gold nanoparticles.

    PubMed

    Cho, Heesook; Yoo, Hana; Park, Soojin

    2010-05-18

    Disposable topographic silicon oxide patterns were fabricated from polymeric replicas of sawtoothed glass surfaces, spin-coating of poly(dimethylsiloxane) (PDMS) thin films, and thermal annealing at certain temperature and followed by oxygen plasma treatment of the thin PDMS layer. A simple imprinting process was used to fabricate the replicated PDMS and PS patterns from sawtoothed glass surfaces. Next, thin layers of PDMS films having different thicknesses were spin-coated onto the sawtoothed PS surfaces and annealed at 60 degrees C to be drawn the PDMS into the valley of the sawtoothed PS surfaces, followed by oxygen plasma treatment to fabricate topographic silicon oxide patterns. By control of the thickness of PDMS layers, silicon oxide patterns having various line widths were fabricated. The silicon oxide topographic patterns were used to direct the self-assembly of polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) block copolymer thin films via solvent annealing process. A highly ordered PS-b-P2VP micellar structure was used to let gold precursor complex with P2VP chains, and followed by oxygen plasma treatment. When the PS-b-P2VP thin films containing gold salts were exposed to oxygen plasma environments, gold salts were reduced to pure gold nanoparticles without changing high degree of lateral order, while polymers were completely degraded. As the width of trough and crest in topographic patterns increases, the number of gold arrays and size of gold nanoparticles are tuned. In the final step, the silicon oxide topographic patterns were selectively removed by wet etching process without changing the arrays of gold nanoparticles.

  14. The effect of nanocrystalline silicon host on magnetic properties of encapsulated iron oxide nanoparticles

    NASA Astrophysics Data System (ADS)

    Granitzer, P.; Rumpf, K.; Gonzalez-Rodriguez, R.; Coffer, J. L.; Reissner, M.

    2015-11-01

    The purpose of this work is a detailed comparison of the fundamental magnetic properties of nanocomposite systems consisting of Fe3O4 nanoparticle-loaded porous silicon as well as silicon nanotubes. Such composite structures are of potential merit in the area of magnetically guided drug delivery. For magnetic systems to be utilized in biomedical applications, there are certain magnetic properties that must be fulfilled. Therefore magnetic properties of embedded Fe3O4-nanoparticles in these nanostructured silicon host matrices, porous silicon and silicon nanotubes, are investigated. Temperature-dependent magnetic investigations have been carried out for four types of iron oxide particle sizes (4, 5, 8 and 10 nm). The silicon host, in interplay with the iron oxide nanoparticle size, plays a sensitive role. It is shown that Fe3O4 loaded porous silicon and SiNTs differ significantly in their magnetic behavior, especially the transition between superparamagnetic behavior and blocked state, due to host morphology-dependent magnetic interactions. Importantly, it is found that all investigated samples meet the magnetic precondition of possible biomedical applications of exhibiting a negligible magnetic remanence at room temperature.The purpose of this work is a detailed comparison of the fundamental magnetic properties of nanocomposite systems consisting of Fe3O4 nanoparticle-loaded porous silicon as well as silicon nanotubes. Such composite structures are of potential merit in the area of magnetically guided drug delivery. For magnetic systems to be utilized in biomedical applications, there are certain magnetic properties that must be fulfilled. Therefore magnetic properties of embedded Fe3O4-nanoparticles in these nanostructured silicon host matrices, porous silicon and silicon nanotubes, are investigated. Temperature-dependent magnetic investigations have been carried out for four types of iron oxide particle sizes (4, 5, 8 and 10 nm). The silicon host, in interplay

  15. Graphene oxide-immobilized NH₂-terminated silicon nanoparticles by cross-linked interactions for highly stable silicon negative electrodes.

    PubMed

    Sun, Cheng; Deng, Yuanfu; Wan, Lina; Qin, Xusong; Chen, Guohua

    2014-07-23

    There is a great interest in the utilization of silicon-based anodes for lithium-ion batteries. However, its poor cycling stability, which is caused by a dramatic volume change during lithium-ion intercalation, and intrinsic low electric conductivity hamper its industrial applications. A facile strategy is reported here to fabricate graphene oxide-immobilized NH2-terminated silicon nanoparticles (NPs) negative electrode (Si@NH2/GO) directed by hydrogen bonding and cross-linked interactions to enhance the capacity retention of the anode. The NH2-modified Si NPs first form strong hydrogen bonds and covalent bonds with GO. The Si@NH2/GO composite further forms hydrogen bonds and covalent bonds with sodium alginate, which acts as a binder, to yield a stable composite negative electrode. These two chemical cross-linked/hydrogen bonding interactions-one between NH2-modified Si NPs and GO, and another between the GO and sodium alginate-along with highly mechanically flexible graphene oxide, produced a robust network in the negative electrode system to stabilize the electrode during discharge and charge cycles. The as-prepared Si@NH2/GO electrode exhibits an outstanding capacity retention capability and good rate performance, delivering a reversible capacity of 1000 mAh g(-1) after 400 cycles at a current of 420 mA g(-1) with almost 100% capacity retention. The results indicated the importance of system-level strategy for fabricating stable electrodes with improved electrochemical performance.

  16. Oxidation and sulfidation resistant alloys with silicon additions

    SciTech Connect

    Dunning, John S.; Alman, David E.; Poston, J.A., Jr.; Siriwardane, R.

    2003-01-01

    The Albany Research Center (ARC) has considerable experience in developing lean chromium, austenitic stainless steels with improved high temperature oxidation resistance. Using basic alloy design principles, a baseline composition of Fe-16Cr-16Ni-2Mn-1Mo alloys with Si and Al addition at a maximum of 5 weight percent was selected for potential application at temperatures above 700ºC for supercritical and ultra-supercritical power plant application. The alloys were fully austenitic. Cyclic oxidation tests in air for 1000 hours were carried out on alloys with Si only or combined Si and Al additions in the temperature range 700ºC to 800ºC. Oxidation resistances of alloys with Si only additions were outstanding, particularly at 800ºC (i.e., these alloys possessed weight gains 4 times less than a standard type-304 alloy). In addition, Si alloys pre-oxidized at 800ºC, showed a zero weight gain in subsequent testing for 1000 hours at 700ºC. Similar improvements were observed for Si only alloy after H2S exposure at 700ºC compared with type 304 stainless steel. SEM and ESCA analysis of the oxide films and base material at the oxide/base metal interface were conducted to study potential rate controlling mechanisms at ARC. Depth profile analysis and element concentration profiles (argon ion etching/x-ray photoelectron spectroscopy) were conducted on oxidized specimens and base material at the National Energy Technology Laboratory.

  17. Oxide thickness dependence of swift heavy ion-induced surface tracks formation in silicon dioxide on silicon structures at grazing incidence

    SciTech Connect

    Carvalho, A. M. J. F.; Touboul, A. D.; Marinoni, M.; Ramonda, M.; Guasch, C.; Saigne, F.; Bonnet, J.; Gasiot, J.

    2007-12-15

    The influence of the oxide thickness in the surface tracks formation in thin silicon dioxide layered-silicon substrate (SiO{sub 2}-Si) irradiated with swift heavy ion is dealt with. In this respect, SiO{sub 2}-Si samples with different oxide thicknesses have been characterized using atomic force microscopy before and after 7.51 MeV/u Xe ion irradiation at a grazing incident angle of 1 deg. relative to the surface plane. Experimental evidence of the existence of a threshold thickness in the formation of swift heavy ion-induced surface tracks has been addressed and discussed according to the thermal spike theory. This experimental upshot can be helpful when assessing metal-oxide-semiconductor ultrathin-gate oxide reliability issues and for growth of silicon-based nanostructures.

  18. Thermal radiative near field transport between vanadium dioxide and silicon oxide across the metal insulator transition

    NASA Astrophysics Data System (ADS)

    Menges, F.; Dittberner, M.; Novotny, L.; Passarello, D.; Parkin, S. S. P.; Spieser, M.; Riel, H.; Gotsmann, B.

    2016-04-01

    The thermal radiative near field transport between vanadium dioxide and silicon oxide at submicron distances is expected to exhibit a strong dependence on the state of vanadium dioxide which undergoes a metal-insulator transition near room temperature. We report the measurement of near field thermal transport between a heated silicon oxide micro-sphere and a vanadium dioxide thin film on a titanium oxide (rutile) substrate. The temperatures of the 15 nm vanadium dioxide thin film varied to be below and above the metal-insulator-transition, and the sphere temperatures were varied in a range between 100 and 200 °C. The measurements were performed using a vacuum-based scanning thermal microscope with a cantilevered resistive thermal sensor. We observe a thermal conductivity per unit area between the sphere and the film with a distance dependence following a power law trend and a conductance contrast larger than 2 for the two different phase states of the film.

  19. Modelling of silicon oxynitridation by nitrous oxide using the reaction rate approach

    SciTech Connect

    Dominique Krzeminski, Christophe

    2013-12-14

    Large technological progress in oxynitridation processing leads to the introduction of silicon oxynitride as ultra-thin gate oxide. On the theoretical side, few studies have been dedicated to the process modelling of oxynitridation. Such an objective is a considerable challenge regarding the various atomistic mechanisms occurring during this fabrication step. In this article, some progress performed to adapt the reaction rate approach for the modelling of oxynitride growth by a nitrous ambient are reported. The Ellis and Buhrman's approach is used for the gas phase decomposition modelling. Taking into account the mass balance of the species at the interface between the oxynitride and silicon, a minimal kinetic model describing the oxide growth has been calibrated and implemented. The influence of nitrogen on the reaction rate has been introduced in an empirical way. The oxidation kinetics predicted with this minimal model compares well with several experiments.

  20. The effect of oxide precipitates on minority carrier lifetime in n-type silicon

    NASA Astrophysics Data System (ADS)

    Murphy, J. D.; Al-Amin, M.; Bothe, K.; Olmo, M.; Voronkov, V. V.; Falster, R. J.

    2015-12-01

    Supersaturated levels of interstitial oxygen in Czochralski silicon can lead to the formation of oxide precipitates. Although beneficial from an internal gettering perspective, oxygen-related extended defects give rise to recombination which reduces minority carrier lifetime. The highest efficiency silicon solar cells are made from n-type substrates in which oxide precipitates can have a detrimental impact on cell efficiency. In order to quantify and to understand the mechanism of recombination in such materials, we correlate injection level-dependent minority carrier lifetime data measured with silicon nitride surface passivation with interstitial oxygen loss and precipitate concentration measurements in samples processed under substantially different conditions. We account for surface recombination, doping level, and precipitate morphology to present a generalised parameterisation of lifetime. The lifetime data are analysed in terms of recombination activity which is dependent on precipitate density or on the surface area of different morphologies of precipitates. Correlation of the lifetime data with interstitial oxygen loss data shows that the recombination activity is likely to be dependent on the precipitate surface area. We generalise our findings to estimate the impact of oxide precipitates with a given surface area on lifetime in both n-type and p-type silicon.

  1. Oxidation Kinetics of Chemically Vapor-Deposited Silicon Carbide in Wet Oxygen

    NASA Technical Reports Server (NTRS)

    Opila, Elizabeth J.

    1994-01-01

    The oxidation kinetics of chemically vapor-deposited SiC in dry oxygen and wet oxygen (P(sub H2O) = 0.1 atm) at temperatures between 1200 C and 1400 C were monitored using thermogravimetric analysis. It was found that in a clean environment, 10% water vapor enhanced the oxidation kinetics of SiC only very slightly compared to rates found in dry oxygen. Oxidation kinetics were examined in terms of the Deal and Grove model for oxidation of silicon. It was found that in an environment containing even small amounts of impurities, such as high-purity Al2O3 reaction tubes containing 200 ppm Na, water vapor enhanced the transport of these impurities to the oxidation sample. Oxidation rates increased under these conditions presumably because of the formation of less protective sodium alumino-silicate scales.

  2. Non-wettable, oxidation-stable, brightly luminescent, perfluorodecyl-capped silicon nanocrystal film.

    PubMed

    Qian, Chenxi; Sun, Wei; Wang, Liwei; Chen, Changlong; Liao, Kristine; Wang, Wendong; Jia, Jia; Hatton, Benjamin D; Casillas, Gilberto; Kurylowicz, Marty; Yip, Christopher M; Mastronardi, Melanie L; Ozin, Geoffrey A

    2014-11-12

    Here we describe for the first time the synthesis of colloidally stable, brightly luminescent perfluorodecyl-capped silicon nanocrystals and compare the properties of solutions and films made from them with those of their perhydrodecyl-capped relatives. The perfluorodecyl capping group compared to the perhydrodecyl capping group yields superior hydrophobicity and much greater resistance to air oxidation, the enhanced electron-withdrawing character induces blue shifts in the wavelength of photoluminescence, and the lower-frequency carbon-fluorine stretching modes disfavor non-radiative relaxation pathways and boost the absolute photoluminescence quantum yield. Together these attributes bode well for advanced materials and biomedical applications founded upon perfluorodecyl-protected silicon nanocrystals.

  3. Inelastic electron scattering in amorphous silicon nitride and aluminum oxide with multiple-scattering corrections

    NASA Astrophysics Data System (ADS)

    Livins, Peteris; Aton, T.; Schnatterly, S. E.

    1988-09-01

    Electron-energy-loss measurements for an amorphous chemical-vapor-deposited silicon nitride film and evaporated sapphire in the broad energy range 1-200 eV are investigated. A method, not requiring the zero-loss peak, to remove the multiple scattering is discussed, applied, and the optical constants obtained. An Elliot-type model used with aluminum oxide gives a valence-exciton binding energy of 1.36+/-0.2 eV with a band gap of 9.8+/-0.2 eV. The unexpected strength of the nitrogen 2s transition is noted in silicon nitride.

  4. Improved the Surface Roughness of Silicon Nanophotonic Devices by Thermal Oxidation Method

    NASA Astrophysics Data System (ADS)

    Shi, Zujun; Shao, Shiqian; Wang, Yi

    2011-02-01

    The transmission loss of the silicon-on-insulator (SOI) waveguide and the coupling loss of the SOI grating are determined to a large extent by the surface roughness. In order to obtain smaller loss, thermal oxidation is a good choice to reduce the surface roughness of the SOI waveguide and grating. Before the thermal oxidation, the root mean square of the surface roughness is over 11 nm. After the thermal oxidation, the SEM figure shows that the bottom of the grating is as smooth as quartz surface, while the AFM shows that the root mean square of the surface is less than 5 nm.

  5. Destruction of monocrystalline silicon with nanosecond pulsed fiber laser accompanied by the oxidation of ablation microparticles

    NASA Astrophysics Data System (ADS)

    Veiko, V. P.; Skvortsov, A. M.; Huynh, C. T.; Petrov, A. A.

    2013-11-01

    In this work, we report an observation of process of local destruction monocrystalline silicon with a scanning beam irradiation of pulse ytterbium fiber laser with a wavelength λ= 1062 nm, accompanied by the oxidation of ablation microparticles. It is shown that depending on the power density of irradiation was observed a large scatter size of the microparticles. From a certain average power density is observed beginning oxidation particulate emitted from the surface of the irradiated area. By varying the parameters of the laser beam such as scanning speed, pulse repetition rate, overlap of laser spot, radiation dose can be achieved almost complete oxidation of all formed during the ablation of microparticles.

  6. Crack healing in silicon nitride due to oxidation

    SciTech Connect

    Choi, S.R.; Tikare, V.; Pawlik, R.

    1991-10-01

    The crack healing behavior of a commercial, MgO-containing, hot pressed Si3N4 was studied as a function of temperature in oxidizing and inert annealing environments. Crack healing occurred at a temperature 800 C or higher due to oxidation regardless of crack size, which ranged from 100 microns (indentation crack) to 1.7 mm (SEPB precrack). The resulting strength and apparent fracture toughness increased at crack healing temperature by 100 percent and 300 percent, respectively. The oxide layer present in the crack plane was found to be highly fatigue resistant, indicating that the oxide is not solely silicate glass, but a mixture of glass, enstatite, and/or cristobalite that was insensitive to fatigue in a room temperature water environment. 20 refs.

  7. Crack healing in silicon nitride due to oxidation

    NASA Technical Reports Server (NTRS)

    Choi, Sung R.; Tikare, Veena; Pawlik, Ralph

    1991-01-01

    The crack healing behavior of a commercial, MgO-containing, hot pressed Si3N4 was studied as a function of temperature in oxidizing and inert annealing environments. Crack healing occurred at a temperature 800 C or higher due to oxidation regardless of crack size, which ranged from 100 microns (indentation crack) to 1.7 mm (SEPB precrack). The resulting strength and apparent fracture toughness increased at crack healing temperature by 100 percent and 300 percent, respectively. The oxide layer present in the crack plane was found to be highly fatigue resistant, indicating that the oxide is not solely silicate glass, but a mixture of glass, enstatite, and/or cristobalite that was insensitive to fatigue in a room temperature water environment.

  8. Activation energies to characterize ease of removal of various kinds of oxygen from bismuth molybdate

    SciTech Connect

    Dadyburjor, D.B.; Ruckenstein, E.

    1980-06-01

    Calculations by the method of minimum energy paths showed that oxygen(-2) anions are more easily displaced from molybdenum(VI) or from the layer between molybdenum and bismuth than from bismuth(III) of a 2:1 bismuth molybdate (Bi/sub 2/MoO/sub 6/). However, available experimental evidence suggests that the oxygen of the bismuth layer is active in the selective oxidation of hydrocarbons; apparently the presence of the hydrocarbon decreases the energy barrier required for transfer of the oxygen anion, and anion vacancies generated, e.g., in a prereduction of the catalyst, also decrease the energy barrier.

  9. Exclusively Gas-Phase Passivation of Native Oxide-Free Silicon(100) and Silicon(111) Surfaces.

    PubMed

    Tao, Ye; Hauert, Roland; Degen, Christian L

    2016-05-25

    Reactions in the gas phase are of primary technological importance for applications in nano- and microfabrication technology and in the semiconductor industry. We present exclusively gas-phase protocols to chemically passivate oxide-free Si(111) and Si(100) surfaces with short-chain alkynes. The resulting surfaces showed equal or better oxidation resistance than most existing liquid-phase-derived surfaces and rivaled the outstanding stability of a full-coverage Si(111)-propenyl surface.1,2 The most stable surface (Si(111)-ethenyl) grew one-fifth of a monolayer of oxide (0.04 nm) after 1 month of air exposure. We monitored the regrowth of oxides on passivated Si(111) and Si(100) surfaces by X-ray photoelectron spectroscopy (XPS) and observed a significant crystal-orientation dependence of initial rates when total oxide thickness was below approximately one monolayer (0.2 nm). This difference was correlated with the desorption kinetics of residual surface Si-F bonds formed during HF treatment. We discuss applications of the technology and suggest future directions for process optimization. PMID:27153212

  10. Microcrystalline silicon oxides for silicon-based solar cells: impact of the O/Si ratio on the electronic structure

    NASA Astrophysics Data System (ADS)

    Bär, M.; Starr, D. E.; Lambertz, A.; Holländer, B.; Alsmeier, J.-H.; Weinhardt, L.; Blum, M.; Gorgoi, M.; Yang, W.; Wilks, R. G.; Heske, C.

    2014-10-01

    Hydrogenated microcrystalline silicon oxide (μc-SiOx:H) layers are one alternative approach to ensure sufficient interlayer charge transport while maintaining high transparency and good passivation in Si-based solar cells. We have used a combination of complementary x-ray and electron spectroscopies to study the chemical and electronic structure of the (μc-SiOx:H) material system. With these techniques, we monitor the transition from a purely Si-based crystalline bonding network to a silicon oxide dominated environment, coinciding with a significant decrease of the material's conductivity. Most Si-based solar cell structures contain emitter/contact/passivation layers. Ideally, these layers fulfill their desired task (i.e., induce a sufficiently high internal electric field, ensure a good electric contact, and passivate the interfaces of the absorber) without absorbing light. Usually this leads to a trade-off in which a higher transparency can only be realized at the expense of the layer's ability to properly fulfill its task. One alternative approach is to use hydrogenated microcrystalline silicon oxide (μc-SiOx:H), a mixture of microcrystalline silicon and amorphous silicon (sub)oxide. The crystalline Si regions allow charge transport, while the oxide matrix maintains a high transparency. To date, it is still unclear how in detail the oxygen content influences the electronic structure of the μc-SiOx:H mixed phase material. To address this question, we have studied the chemical and electronic structure of the μc-SiOx:H (0 <= x = O/Si <=1) system with a combination of complementary x-ray and electron spectroscopies. The different surface sensitivities of the employed techniques help to reduce the impact of surface oxides on the spectral interpretation. For all samples, we find the valence band maximum to be located at a similar energy with respect to the Fermi energy. However, for x > 0.5, we observe a pronounced decrease of Si 3s - Si 3p hybridization in favor

  11. Extracting mechanical properties of copper coatings on oxidized silicon substrates by nanoindentation

    NASA Astrophysics Data System (ADS)

    Moharrami, N.; Oila, A.; Bull, S. J.

    2014-08-01

    The thickness of the copper coatings that are used for the manufacture of conducting tracks in microelectronic devices are being aggressively scaled down and there is a need to monitor the mechanical response of metallization at a scale comparable to the material microstructure. When using indentation tests to assess the properties of thin films, the plastic zone dimensions are of a similar scale to the grain size. For the purposes of designs based on continuum mechanics approaches it is usually required that the grain size is much smaller than the deforming volume, which is not always observed in practice. Considerable differences between predicted and observed performance can be seen depending on the material tested and its grain size; the extent of oxidation of the copper after deposition is critical, as is that of its underlying silicon substrate. Whereas it is possible to make good measurements of metallization properties on stiff substrates such as silicon there are serious issues with the reliability of Young's modulus and hardness data from coatings on device quality wafers which may have been oxidized prior to use. The effects of grain size, shape and orientation on the mechanical response of metallic thin films used for semiconductor metallization on oxidized silicon are presented in this paper. The appropriate conditions for the successful use of continuum mechanics are discussed and the importance of considering the consequences of crystallographic anisotropy and oxidation on the selection of suitable design data is presented with regards to copper coatings.

  12. Effect of W and WC on the oxidation resistance of yttria-doped silicon nitride

    NASA Technical Reports Server (NTRS)

    Schuon, S.

    1980-01-01

    The effect of tungsten and tungsten carbide contamination on the oxidation and cracking in air of yttria-doped silicon nitride ceramics is investigated. Silicon nitride powder containing 8 wt % Y2O3 was doped with 2 wt % W, 4 wt % W, 2 wt % WC or left undoped, and sintered in order to simulate contamination during milling, and specimens were exposed in air to 500, 750 and 1350 C for various lengths of time. Scanning electron and optical microscopy and X-ray diffraction of the specimens in the as-sintered state reveals that the addition of W or WC does not affect the phase relationships in the system, composed of alpha and beta Si3N4, melilite and an amorphous phase. Catastrophic oxidation is observed at 750 C in specimens containing 2 and 4 wt % W, accompanied by the disappearance of alpha Si3N4 and melilite from the structure. At 1350 C, the formation of a protective glassy oxide layer was observed on all specimens without catastrophic oxidation, and it is found that pre-oxidation at 1350 C also improved the oxidation resistance at 750 C of bars doped with 4 wt % W. It is suggested that tungsten contamination from WC grinding balls may be the major cause of the intermediate-temperature cracking and instability frequently observed in Si3N4-8Y2O3.

  13. Identification and Control of Gravity Related Defect Formation During Melt Growth of Bismuth-Silicate (Bi12SiO20)

    NASA Technical Reports Server (NTRS)

    Zheng, Y.; Witt, A. F.

    1999-01-01

    In the light of strong indications that a majority of critical defects formed in bismuth silicon oxide (BSO) during growth from the melt is related directly or indirectly to gravitational interference, it is suggested to use the reduced gravity environment of outer space for experimentation directed at the identification and control of these defects. The results of these experiments are expected to lead to advances in our understanding of crystal growth related defect formation in general and will establish a basis for effective defect engineering, the approach to efficient achievement of defect related, application specific properties in opto-electronic materials

  14. Thermal oxidation of silicon in a residual oxygen atmosphere—the RESOX process—for self-limiting growth of thin silicon dioxide films

    NASA Astrophysics Data System (ADS)

    Wright, Jason T.; Carbaugh, Daniel J.; Haggerty, Morgan E.; Richard, Andrea L.; Ingram, David C.; Kaya, Savas; Jadwisienczak, Wojciech M.; Rahman, Faiz

    2016-10-01

    We describe in detail the growth procedures and properties of thermal silicon dioxide grown in a limited and dilute oxygen atmosphere. Thin thermal oxide films have become increasingly important in recent years due to the continuing down-scaling of ultra large scale integration metal oxide silicon field effect transistors. Such films are also of importance for organic transistors where back-gating is needed. The technique described here is novel and allows self-limited formation of high quality thin oxide films on silicon surfaces. This technique is easy to implement in both research laboratory and industrial settings. Growth conditions and their effects on film growth have been described. Properties of the resulting oxide films, relevant for microelectronic device applications, have also been investigated and reported here. Overall, our findings are that thin, high quality, dense silicon dioxide films of thicknesses up to 100 nm can be easily grown in a depleted oxygen environment at temperatures similar to that used for usual silicon dioxide thermal growth in flowing dry oxygen.

  15. Efficient processing of reaction-sintered silicon carbide by anodically oxidation-assisted polishing

    NASA Astrophysics Data System (ADS)

    Tu, Qunzhang; Shen, Xinmin; Zhou, Jianzhao; He, Xiaohui; Yamamura, Kazuya

    2015-10-01

    Reaction-sintered silicon carbide (RS-SiC) is a promising optical material for the space telescope systems. Anodically oxidation-assisted polishing is a method to machine RS-SiC. The electrolyte used in this study is a mixture of hydrogen peroxide (H2O2) and hydrochloric acid (HCl), and the oxidation potential has two modes: constant potential and high-frequency-square-wave potential. Oxide morphologies are compared by scanning electron microscope/energy dispersive x-ray spectroscopy and scanning white-light interferometer. The results indicate that anodic oxidation under constant potential can not only obtain a relatively smooth surface but also be propitious to obtain high material removal rate. The oxidation depth in anodic oxidation under constant potential is calculated by comparing surface morphologies before and after hydrofluoric acid etching. The theoretical oxidation rate is 5.3 nm/s based on the linear Deal-Grove model. Polishing of the oxidized RS-SiC is conducted to validate the machinability of the oxide layer. The obtained surface roughness root-mean-square is around 4.5 nm. Thus, anodically oxidation-assisted polishing can be considered as an efficient method, which can fill the performance gap between the rough figuring and fine finishing of RS-SiC. It can improve the machining quality of RS-SiC parts and promote the application of RS-SiC products.

  16. Molten Pb as a catalyst for large-scale growth of highly aligned silicon oxide nanowires

    NASA Astrophysics Data System (ADS)

    Zhang, Jun; Jiang, Feihong; Yang, Yongdong; Li, Jianping

    2007-09-01

    Low melting point metal Pb can be used as an effective catalyst for the large-scale growth of highly aligned silicon oxide nanowire balls. Unlike any previously observed results using Au or Fe as catalyst, the molten Pb-catalyzed vapor-liquid-solid (VLS) growth exhibits many amazing growth phenomena. The scan electron microscopy (SEM) data indicate that the silicon oxide nanowires grow out perpendicularly from the surface of the metal Pb balls. For each ball, numerous nanowires simultaneously nucleate, grow at nearly the same rate and direction, and simultaneously stop growing. The pear-like, flower-like, chrysanthemum-like, and echinus-like SiO 2 nanostructures were formed. A growth model was proposed. The experimental results further expand the low melting point metal-catalyzed VLS mechanism to a broader range.

  17. Production of Silicon Oxide like Thin Films by the Use of Atmospheric Plasma Torch

    NASA Astrophysics Data System (ADS)

    Ozono, E. M.; Fachini, E. R.; Silva, M. L. P.; Ruchko, L. F.; Galvão, R. M. O.

    2015-03-01

    The advantages of HMDS (hexamethyldisilazane) APT-plasma films for sensor applications were explored producing films in a three-turn copper coil APT equipment. HMDS was introduced into the argon plasma at four different conditions. Additional flux of oxygen could modulate the presence of organic components in the film, the composition varying from pure inorganic oxides to organo-silane polymers. Oxygen promoted deposition rates as high as 900 nm/min on silicon, acrylic or piezoelectric quartz crystal substrates. Films with a clustered morphology and refractive index of 1.45 were obtained, mainly due to a silicon oxide structure. Raman spectroscopy and XPS data showed the presence of CHn and amorphous carbon in the inorganic matrix. The films were sensitive to the humidity of the air. The adsorptive capabilities of outstanding films were tested in a Quartz Crystal Microbalance (QCM). The results support that those films can be a useful and simple alternative for the development of sensors.

  18. Oxidation resistant high temperature thermal cycling resistant coatings on silicon-based substrates and process for the production thereof

    DOEpatents

    Sarin, Vinod K.

    1990-01-01

    An oxidation resistant, high temperature thermal cycling resistant coated ceramic article for ceramic heat engine applications. The substrate is a silicon-based material, i.e. a silicon nitride- or silicon carbide-based monolithic or composite material. The coating is a graded coating of at least two layers: an intermediate AlN or Al.sub.x N.sub.y O.sub.z layer and an aluminum oxide or zirconium oxide outer layer. The composition of the coating changes gradually from that of the substrate to that of the AlN or Al.sub.x N.sub.y O.sub.z layer and further to the composition of the aluminum oxide or zirconium oxide outer layer. Other layers may be deposited over the aluminum oxide layer. A CVD process for depositing the graded coating on the substrate is also disclosed.

  19. Oxidation resistant high temperature thermal cycling resistant coatings on silicon-based substrates and process for the production thereof

    DOEpatents

    Sarin, V.K.

    1990-08-21

    An oxidation resistant, high temperature thermal cycling resistant coated ceramic article for ceramic heat engine applications is disclosed. The substrate is a silicon-based material, i.e. a silicon nitride- or silicon carbide-based monolithic or composite material. The coating is a graded coating of at least two layers: an intermediate AlN or Al[sub x]N[sub y]O[sub z] layer and an aluminum oxide or zirconium oxide outer layer. The composition of the coating changes gradually from that of the substrate to that of the AlN or Al[sub x]N[sub y]O[sub z] layer and further to the composition of the aluminum oxide or zirconium oxide outer layer. Other layers may be deposited over the aluminum oxide layer. A CVD process for depositing the graded coating on the substrate is also disclosed.

  20. Silicon based solar cells using a multilayer oxide as emitter

    NASA Astrophysics Data System (ADS)

    Bao, Jie; Wu, Weiliang; Liu, Zongtao; Shen, Hui

    2016-08-01

    In this work, n-type silicon based solar cells with WO3/Ag/WO3 multilayer films as emitter (WAW/n-Si solar cells) were presented via simple physical vapor deposition (PVD). Microstructure and composition of WAW/n-Si solar cells were studied by TEM and XPS, respectively. Furthermore, the dependence of the solar cells performances on each WO3 layer thickness was investigated. The results indicated that the bottom WO3 layer mainly induced band bending and facilitated charge-carriers separation, while the top WO3 layer degraded open-circuit voltage but actually improved optical absorption of the solar cells. The WAW/n-Si solar cells, with optimized bottom and top WO3 layer thicknesses, exhibited 5.21% efficiency on polished wafer with area of 4 cm2 under AM 1.5 condition (25 °C and 100 mW/cm2). Compared with WO3 single-layer film, WAW multilayer films demonstrated better surface passivation quality but more optical loss, while the optical loss could be effectively reduced by implementing light-trapping structures. These results pave a new way for dopant-free solar cells in terms of low-cost and facile process flow.

  1. Bismuth catalysts in aqueous media.

    PubMed

    Kobayashi, Shū; Ueno, Masaharu; Kitanosono, Taku

    2012-01-01

    Several bismuth-catalyzed synthetic reactions, which proceed well in aqueous media, are discussed. Due to increasing demand of water as a solvent in organic synthesis, catalysts that can be used in aqueous media are becoming more and more important. Although bismuth Lewis acids are not very stable in water, it has been revealed that they can be stabilized by basic ligands. Chiral amine and related basic ligands combined with bismuth Lewis acids are particularly useful in asymmetric catalysis in aqueous media. On the other hand, bismuth hydroxide is stable and works as an efficient catalyst for carbon-carbon bond-forming reactions in water. PMID:21769719

  2. Bismuth and niobium co-doped barium cobalt oxide as a promising cathode material for intermediate temperature solid oxide fuel cells

    NASA Astrophysics Data System (ADS)

    He, Shaofei; Le, Shiru; Guan, Lili; Liu, Tao; Sun, Kening

    2015-11-01

    Perovskite oxides BaBi0.05Co0.95-yNbyO3-δ (BBCNy, 0 ≤ y ≤ 0.2) are synthesized and evaluated as potential cathode materials for intermediate temperature solid oxide fuel cells (IT-SOFCs). Highly charged Nb5+ successfully stabilizes the cubic perovskite structure to room temperature with Nb substituting content y ≥ 0.1. The phase structure, thermal expansion behavior, electrical conductivity and electrochemical performance of BBCNy with cubic phase are systematically studied. The samples exhibit excellent chemical compatibility with GDC and have sufficiently high electrical conductivities. However, the thermal expansion coefficients of BBCNy samples are nearly twice those of the most commonly used electrolyte materials YSZ and GDC, which is a major drawback for application in IT-SOFCs. The polarization resistances of BBCNy with y = 0.10, 0.15 and 0.20 on GDC electrolyte are 0.086, 0.079 and 0.107 Ω cm2 at 700 °C, respectively. Even though the YSZ electrolyte membrane and GDC barrier layer are approximately 50 μm and 10 μm in thickness, the highest maximum power density (1.23 W cm-2) of the single cell Ni-YSZ|YSZ|GDC|BBCN0.15 is obtained at 750 °C. Good long-term stability of the single cell with BBCN0.15 cathode is also demonstrated. These results demonstrate that BBCNy perovskite oxides with cubic structure are very promising cathode materials for IT-SOFCs.

  3. Phosphorus-induced positive charge in native oxide of silicon wafers

    NASA Astrophysics Data System (ADS)

    Shimizu, Hirofumi; Munakata, Chusuke

    1994-06-01

    Alternating current surface photovoltage is enhanced in p-type silicon (Si) wafers, which are rinsed with a phosphorus (P)-contaminated water solution, whereas it is reduced in n-type Si wafers, indicating that the positive charge appears at wafer surfaces. This result suggests that P reacts with SiO2 in the form of (POSi)+ network, causing a positive charge in the native oxide.

  4. THORIUM DISPERSION IN BISMUTH

    DOEpatents

    Bryner, J.S.

    1961-07-01

    The growth of thorium bismutaide particles, which are formed when thorium is suspended in liquid bismuth, is inhibited when the liquid metal suspension is being flowed through a reactor and through a heat exchanger in sequence. It involves the addition of as little as 1 part by weight of tellurium to 100 parts of thorium. This addition is sufficient to inhibit particle growth and agglomeration.

  5. Development of disposable bulk-modified screen-printed electrode based on bismuth oxide for stripping chronopotentiometric analysis of lead (II) and cadmium (II) in soil and water samples.

    PubMed

    Kadara, Rashid O; Tothill, Ibtisam E

    2008-08-01

    A bulk-modified screen-printed carbon electrode characterised for metal ion detection is presented. Bismuth oxide (Bi(2)O(3)) was mixed with graphite-carbon ink to obtain the modified electrode. The best composition was 2% Bi(2)O(3) (wt%) in the graphite-carbon ink. The modified electrode with onboard screen-printed carbon counter and silver-silver chloride pseudo-reference electrodes exhibited good performance in the electrochemical measurement of lead (II) and cadmium (II). The electrode displayed excellent linear behaviour in the concentration range examined (20-300 microg L(-1)) with limits of detection of 8 and 16 microg L(-1) for both lead (II) and cadmium (II), respectively. The analytical utility of the modified electrode was illustrated by the stripping chronopotentiometric determinations of lead (II) in soil extracts and wastewater samples.

  6. Room-temperature formation of low refractive index silicon oxide films using atmospheric-pressure plasma.

    PubMed

    Nakamura, Kei; Yamaguchi, Yoshihito; Yokoyama, Keiji; Higashida, Kosuke; Ohmi, Hiromasa; Kakiuchi, Hiroaki; Yasutake, Kiyoshi

    2011-04-01

    This study aims to apply atmospheric-pressure (AP) plasma to the fabrication of single-layer anti-reflection (AR) coatings with porous silicon oxide. 150 MHz very high-frequency (VHF) excitation of AP plasma permits to enhance the chemical reactions both in the gas phase and on the film-growing surface, increasing deposition rate significantly. Silicon oxide films were prepared from silane (SiH4) and carbon dioxide (CO2) dual sources diluted with helium. The microstructure and refractive index of the films were studied using infrared absorption and ellipsometry as a function of VHF power density. It was shown that significant increase in deposition rate at room temperature prevented the formation of a dense SiO2 network, decreasing refractive index of the resulting film effectively. As a result, a porous silicon oxide film, which had the lowest refractive index of 1.24 at 632.8 nm, was obtained with a very high deposition rate of 235 nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave AR coating of a glass plate.

  7. Thermal annealing of thin PECVD silicon-oxide films for airgap-based optical filters

    NASA Astrophysics Data System (ADS)

    Ghaderi, M.; de Graaf, G.; Wolffenbuttel, R. F.

    2016-08-01

    This paper investigates the mechanical and optical properties of thin PECVD silicon-oxide layers for optical applications. The different deposition parameters in PECVD provide a promising tool to manipulate and control the film structure. Membranes for use in optical filters typically are of ~λ/4n thickness and should be slightly tensile for remaining flat, thus avoiding scattering. The effect of the thermal budget of the process on the mechanical characteristics of the deposited films was studied. Films with compressive stress ranging from  ‑100 to 0 MPa were deposited. Multiple thermal annealing cycles were applied to wafers and the in situ residual stress and ex situ optical properties were measured. The residual stress in the films was found to be highly temperature dependent. Annealing during the subsequent process steps results in tensile stress from 100 to 300 MPa in sub-micron thick PECVD silicon-oxide films. However, sub-100 nm thick PECVD silicon-oxide layers exhibit a lower dependence on the thermal annealing cycles, resulting in lower stress variations in films after the annealing. It is also shown that the coefficient of thermal expansion, hence the residual stress in layers, varies with the thickness. Finally, several free-standing membranes were fabricated and the results are compared.

  8. Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy

    SciTech Connect

    Ali, Dyan; Richardson, Christopher J. K.

    2012-11-15

    This article reports on the comparison of beryllium oxide and pyrolytic graphite as crucible liners in a high-temperature effusion cell used for boron doping in silicon grown by molecular beam epitaxy. Secondary ion mass spectroscopy analysis indicates decomposition of the beryllium oxide liner, leading to significant incorporation of beryllium and oxygen in the grown films. The resulting films are of poor crystal quality with rough surfaces and broad x-ray diffraction peaks. Alternatively, the use of pyrolytic graphite crucible liners results in higher quality films.

  9. Patterns of discoloration and oxidation by direct and scattered fluxes, especially oxygen on silicon

    NASA Technical Reports Server (NTRS)

    Frederickson, A. R.; Filz, R. C.; Rich, F. J.; Sagalyn, Paul L.

    1991-01-01

    A number of interesting discoloration patterns are clearly evident on M0002-1 which resides on three faces of LDEF: front face, rear face, and earth face. Most interesting is the pattern of blue oxidation on polished single crystal silicon apparently produced by once-scattered ram oxygen atoms along the earth face. Most of the other patterns are seen in the Thermal Control Paint. Also, severe oxidation of CR-39 polycarbonate occurred on the front face of LDEF, as expected. A complete explanation for the patterns has not yet been obtained.

  10. Coherent x-ray diffraction imaging of silicon oxide growth

    NASA Astrophysics Data System (ADS)

    Robinson, I. K.; Libbert, J. L.; Vartanyants, I. A.; Pitney, J. A.; Smilgies, D. M.; Abernathy, D. L.; Grübel, G.

    1999-10-01

    We have measured the morphology of Si samples as a function of time in air after stripping of the native oxide. For this purpose we examined the reflectivity of a coherent beam of x rays, which produces a structured diffraction pattern. We have made further progress in the development of an inversion algorithm for conversion of these patterns into one-dimensional height images. Nanometer-sized features are found to grow and evolve in waves across the surface on the time scale of minutes to hours.

  11. Simulation of Nanoscale Two-Bit Not-And-type Silicon-Oxide-Nitride-Oxide-Silicon Nonvolatile Memory Devices with a Separated Double-Gate Fin Field Effect Transistor Structure Containing Different Tunneling Oxide Thicknesses

    NASA Astrophysics Data System (ADS)

    Oh, Se Woong; Park, Sang Su; Kim, Dong Hun; Kim, Hyun Woo; Kim, Tae Whan

    2009-06-01

    Not-and (NAND)-type silicon-oxide-nitride-oxide-silicon (SONOS) nonvolatile memory (NVM) devices with a separated double-gate (SDG) Fin field effect transistor structure were proposed to reduce the unit cell size of such memory devices and increase their memory density in comparison with that of conventional NVM devices. The proposed memory device consisted of a pair of control gates separated along the length of the Fin channel direction. Each SDG had a different thickness of the tunneling oxide to operate the proposed memory device as a two-bit/cell device. A technology computer-aided design simulation was performed to investigate the program/erase and two-bit characteristics. The simulation results show that the proposed devices can be used to increase the scaling down capability and charge storage density of NAND-type SONOS NVM devices.

  12. Bismuth toxicity in patients treated with bismuth iodoform paraffin packs.

    PubMed

    Atwal, A; Cousin, G C S

    2016-01-01

    Bismuth is a heavy metal used in bismuth iodoform paraffin paste (BIPP) antiseptic dressings and in a number of other medical preparations. It can be absorbed systemically and cause toxicity. We report 2 cases of such neurotoxicity after it was used in operations on the jaws.

  13. Structural silicon nitride materials containing rare earth oxides

    DOEpatents

    Andersson, Clarence A.

    1980-01-01

    A ceramic composition suitable for use as a high-temperature structural material, particularly for use in apparatus exposed to oxidizing atmospheres at temperatures of 400 to 1600.degree. C., is found within the triangular area ABCA of the Si.sub.3 N.sub.4 --SiO.sub.2 --M.sub.2 O.sub.3 ternary diagram depicted in FIG. 1. M is selected from the group of Yb, Dy, Er, Sc, and alloys having Yb, Y, Er, or Dy as one component and Sc, Al, Cr, Ti, (Mg +Zr) or (Ni+Zr) as a second component, said alloy having an effective ionic radius less than 0.89 A.

  14. Resistive switching characteristics and mechanisms in silicon oxide memory devices

    NASA Astrophysics Data System (ADS)

    Chang, Yao-Feng; Fowler, Burt; Chen, Ying-Chen; Zhou, Fei; Wu, Xiaohan; Chen, Yen-Ting; Wang, Yanzhen; Xue, Fei; Lee, Jack C.

    2016-05-01

    Intrinsic unipolar SiOx-based resistance random access memories (ReRAM) characterization, switching mechanisms, and applications have been investigated. Device structures, material compositions, and electrical characteristics are identified that enable ReRAM cells with high ON/OFF ratio, low static power consumption, low switching power, and high readout-margin using complementary metal-oxide semiconductor transistor (CMOS)-compatible SiOx-based materials. These ideas are combined with the use of horizontal and vertical device structure designs, composition optimization, electrical control, and external factors to help understand resistive switching (RS) mechanisms. Measured temperature effects, pulse response, and carrier transport behaviors lead to compact models of RS mechanisms and energy band diagrams in order to aid the development of computer-aided design for ultralarge-v scale integration. This chapter presents a comprehensive investigation of SiOx-based RS characteristics and mechanisms for the post-CMOS device era.

  15. In situ investigation of mesoporous silicon oxidation kinetics using infrared emittance spectroscopy.

    PubMed

    Bardet, Benjamin; De Sousa Meneses, Domingos; Defforge, Thomas; Billoué, Jérôme; Gautier, Gaël

    2016-07-21

    In this paper, we study the thermal oxidation kinetics of mesoporous silicon layers, synthesized by electrochemical anodization, from 260 °C up to 1100 °C. A specific apparatus is employed to heat the mesoporous samples in air and to record at the same time their infrared emittance. Based on Bruggeman effective medium approximation, an optical model is set up to realistically approximate the dielectric function of the porous material with an emphasis on the surface chemistry and oxide content. A transition temperature of 600 °C is evidenced from data processing which gives evidence of two oxidation mechanisms with distinct kinetics. Between 260-600 °C, the oxidation is surface-limited with kinetics dependent on the hydrogen desorption rate. However, above 600 °C, the oxide growth is limited by oxygen diffusion through the existing oxide layer. A parabolic law is employed to fit the oxidation rate and to extract the high-temperature activation energy (EA = 1.5 eV). A precise control of the oxide growth can thus be achieved.

  16. In situ investigation of mesoporous silicon oxidation kinetics using infrared emittance spectroscopy.

    PubMed

    Bardet, Benjamin; De Sousa Meneses, Domingos; Defforge, Thomas; Billoué, Jérôme; Gautier, Gaël

    2016-07-21

    In this paper, we study the thermal oxidation kinetics of mesoporous silicon layers, synthesized by electrochemical anodization, from 260 °C up to 1100 °C. A specific apparatus is employed to heat the mesoporous samples in air and to record at the same time their infrared emittance. Based on Bruggeman effective medium approximation, an optical model is set up to realistically approximate the dielectric function of the porous material with an emphasis on the surface chemistry and oxide content. A transition temperature of 600 °C is evidenced from data processing which gives evidence of two oxidation mechanisms with distinct kinetics. Between 260-600 °C, the oxidation is surface-limited with kinetics dependent on the hydrogen desorption rate. However, above 600 °C, the oxide growth is limited by oxygen diffusion through the existing oxide layer. A parabolic law is employed to fit the oxidation rate and to extract the high-temperature activation energy (EA = 1.5 eV). A precise control of the oxide growth can thus be achieved. PMID:27333267

  17. Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping

    PubMed Central

    Rossi, Alessandro; Tanttu, Tuomo; Hudson, Fay E.; Sun, Yuxin; Möttönen, Mikko; Dzurak, Andrew S.

    2015-01-01

    As mass-produced silicon transistors have reached the nano-scale, their behavior and performances are increasingly affected, and often deteriorated, by quantum mechanical effects such as tunneling through single dopants, scattering via interface defects, and discrete trap charge states. However, progress in silicon technology has shown that these phenomena can be harnessed and exploited for a new class of quantum-based electronics. Among others, multi-layer-gated silicon metal-oxide-semiconductor (MOS) technology can be used to control single charge or spin confined in electrostatically-defined quantum dots (QD). These QD-based devices are an excellent platform for quantum computing applications and, recently, it has been demonstrated that they can also be used as single-electron pumps, which are accurate sources of quantized current for metrological purposes. Here, we discuss in detail the fabrication protocol for silicon MOS QDs which is relevant to both quantum computing and quantum metrology applications. Moreover, we describe characterization methods to test the integrity of the devices after fabrication. Finally, we give a brief description of the measurement set-up used for charge pumping experiments and show representative results of electric current quantization. PMID:26067215

  18. Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping.

    PubMed

    Rossi, Alessandro; Tanttu, Tuomo; Hudson, Fay E; Sun, Yuxin; Möttönen, Mikko; Dzurak, Andrew S

    2015-06-03

    As mass-produced silicon transistors have reached the nano-scale, their behavior and performances are increasingly affected, and often deteriorated, by quantum mechanical effects such as tunneling through single dopants, scattering via interface defects, and discrete trap charge states. However, progress in silicon technology has shown that these phenomena can be harnessed and exploited for a new class of quantum-based electronics. Among others, multi-layer-gated silicon metal-oxide-semiconductor (MOS) technology can be used to control single charge or spin confined in electrostatically-defined quantum dots (QD). These QD-based devices are an excellent platform for quantum computing applications and, recently, it has been demonstrated that they can also be used as single-electron pumps, which are accurate sources of quantized current for metrological purposes. Here, we discuss in detail the fabrication protocol for silicon MOS QDs which is relevant to both quantum computing and quantum metrology applications. Moreover, we describe characterization methods to test the integrity of the devices after fabrication. Finally, we give a brief description of the measurement set-up used for charge pumping experiments and show representative results of electric current quantization.

  19. Enhancing the far-ultraviolet sensitivity of silicon complementary metal oxide semiconductor imaging arrays

    NASA Astrophysics Data System (ADS)

    Retherford, Kurt D.; Bai, Yibin; Ryu, Kevin K.; Gregory, James A.; Welander, Paul B.; Davis, Michael W.; Greathouse, Thomas K.; Winters, Gregory S.; Suntharalingam, Vyshnavi; Beletic, James W.

    2015-10-01

    We report our progress toward optimizing backside-illuminated silicon P-type intrinsic N-type complementary metal oxide semiconductor devices developed by Teledyne Imaging Sensors (TIS) for far-ultraviolet (UV) planetary science applications. This project was motivated by initial measurements at Southwest Research Institute of the far-UV responsivity of backside-illuminated silicon PIN photodiode test structures, which revealed a promising QE in the 100 to 200 nm range. Our effort to advance the capabilities of thinned silicon wafers capitalizes on recent innovations in molecular beam epitaxy (MBE) doping processes. Key achievements to date include the following: (1) representative silicon test wafers were fabricated by TIS, and set up for MBE processing at MIT Lincoln Laboratory; (2) preliminary far-UV detector QE simulation runs were completed to aid MBE layer design; (3) detector fabrication was completed through the pre-MBE step; and (4) initial testing of the MBE doping process was performed on monitoring wafers, with detailed quality assessments.

  20. Optimization of oxidation processes to improve crystalline silicon solar cell emitters

    SciTech Connect

    Shen, L.; Liang, Z. C. Liu, C. F.; Long, T. J.; Wang, D. L.

    2014-02-15

    Control of the oxidation process is one key issue in producing high-quality emitters for crystalline silicon solar cells. In this paper, the oxidation parameters of pre-oxidation time, oxygen concentration during pre-oxidation and pre-deposition and drive-in time were optimized by using orthogonal experiments. By analyzing experimental measurements of short-circuit current, open circuit voltage, series resistance and solar cell efficiency in solar cells with different sheet resistances which were produced by using different diffusion processes, we inferred that an emitter with a sheet resistance of approximately 70 Ω/□ performed best under the existing standard solar cell process. Further investigations were conducted on emitters with sheet resistances of approximately 70 Ω/□ that were obtained from different preparation processes. The results indicate that emitters with surface phosphorus concentrations between 4.96 × 10{sup 20} cm{sup −3} and 7.78 × 10{sup 20} cm{sup −3} and with junction depths between 0.46 μm and 0.55 μm possessed the best quality. With no extra processing, the final preparation of the crystalline silicon solar cell efficiency can reach 18.41%, which is an increase of 0.4%{sub abs} compared to conventional emitters with 50 Ω/□ sheet resistance.

  1. Structural and optical properties of silicon metal-oxide-semiconductor light-emitting devices

    NASA Astrophysics Data System (ADS)

    Xu, Kaikai; Zhang, Zhengyuan; Zhang, Zhengping

    2016-01-01

    A silicon p-channel metal oxide semiconductor field-effect transistor (Si-PMOSFET) that is fully compatible with the standard complementary metal oxide semiconductor process is investigated based on the phenomenon of optical radiation observed in the reverse-biased p-n junction in the Si-PMOSFET device. The device can be used either as a two-terminal silicon diode light-emitting device (Si-diode LED) or as a three-terminal silicon gate-controlled diode light-emitting device (Si gate-controlled diode LED). It is seen that the three-terminal operating mode could provide much higher power transfer efficiency than the two-terminal operating mode. A new solution based on the concept of a theoretical quantum efficiency model combined with calculated results is proposed for interpreting the evidence of light intensity reduction at high operating voltages. The Si-LED that can be easily integrated into CMOS fabrication process is an important step toward optical interconnects.

  2. Oxidation of freestanding silicon nanocrystals probed with electron spin resonance of interfacial dangling bonds

    NASA Astrophysics Data System (ADS)

    Pereira, R. N.; Rowe, D. J.; Anthony, R. J.; Kortshagen, U.

    2011-04-01

    The oxidation of freestanding silicon nanocrystals (Si-NCs) passivated with Si-H bonds has been investigated for a wide range of oxidation times (from a few minutes to several months) by means of electron spin resonance (ESR) of dangling bonds (DBs) naturally incorporated at the interface between the NC core and the developing oxide shell. These measurements are complemented with surface chemistry analysis from Fourier transform infrared spectroscopy. Two surface phenomena with initiation time thresholds of 15 min and 30 h are inferred from the dependence of ESR spectra on oxidation time. The first initiates before oxidation of surface Si-Si bonds and destruction of the NC hydrogen termination takes place (induction period) and results in a decrease of the DB density and a localization of the DB orbital at the central Si atom. Within the Cabrera-Mott oxidation mechanism, we associate this process with the formation of intermediate interfacial configurations, resulting from surface adsorption of water and oxygen molecules. The second surface phenomenon leads to a steep increase of the defect density and correlates with the formation of surface Si-O-Si bridges, lending experimental support to theoretically proposed mechanisms for interfacial defect formation involving the emission of Si interstitials at the interface between crystalline Si and the growing oxide.

  3. Fluorinated alkyne-derived monolayers on oxide-free silicon nanowires via one-step hydrosilylation

    NASA Astrophysics Data System (ADS)

    Nguyen Minh, Quyen; Pujari, Sidharam P.; Wang, Bin; Wang, Zhanhua; Haick, Hossam; Zuilhof, Han; van Rijn, Cees J. M.

    2016-11-01

    Passivation of oxide-free silicon nanowires (Si NWs) by the formation of high-quality fluorinated 1-hexadecyne-derived monolayers with varying fluorine content has been investigated. Alkyl chain monolayers (C16H30-xFx) with a varying number of fluorine substituents (x = 0, 1, 3, 9, 17) were attached onto hydrogen-terminated silicon (Sisbnd H) surfaces with an effective one-step hydrosilylation. This surface chemistry gives well-defined monolayers on nanowires that have a cylindrical core-shell structure, as characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FT-IR) and static contact angle (SCA) analysis. The monolayers were stable under acidic and basic conditions, as well as under extreme conditions (such as UV exposure), and provide excellent surface passivation, which opens up applications in the fields of field effect transistors, optoelectronics and especially for disease diagnosis.

  4. Corrosion behavior of silicon nitride, magnesium oxide, and several metals in molten calcium chloride with chlorine

    SciTech Connect

    McLaughlin, D. . Research and Development Center); Sesions, C.E.; Marra, J.E. )

    1992-08-01

    In this paper corrosion studies are described in a molten calcium chloride environment sparged with chlorine gas at 850{degrees}C, both in the melt and in the gas phase above the salt, in support of efforts at Westinghouse Savannah River Company to develop more resistant materials of construction for molten salt processing of plutonium. Corrosion rates and electron microscope analyses are reported for Inconel alloys 601 and 617, tantalum, tungsten, magnesium oxide, and silicon nitride. Silicon nitride exhibited the greatest resistance, showing {lt}0.1 mg/cm{sup 2} {center dot} h loss in both melt and vapor None of the metallic coupons withstood the chlorine vapor environment, although Inconel indicated resistance immersed in the melt if protected from chlorine gas.

  5. Electrochemically reduced graphene oxide on silicon nanowire arrays for enhanced photoelectrochemical hydrogen evolution.

    PubMed

    Meng, Huan; Fan, Ke; Low, Jingxiang; Yu, Jiaguo

    2016-09-21

    Photoelectrochemical (PEC) water splitting into hydrogen and oxygen by sunlight is a promising approach to solve energy and environmental problems. In this work, silicon nanowire arrays (SiNWs) photocathodes decorated with reduced graphene oxide (rGO) for PEC water splitting were successfully prepared by a flexible and scalable electrochemical reduction method. The SiNWs photocathode with the optimized rGO decoration (SiNWs/rGO20) shows an enhanced activity with a much higher photocurrent density and significantly positive shift of onset potential compared to the bare SiNWs arrays for the hydrogen evolution reaction (HER). The enhanced PEC activity is ascribed to the high electrical conductivity of rGO and improved separation of the photogenerated charge carriers. This work not only demonstrates a facile, rapid and tunable electrochemical reduction method to produce rGO, but also exhibits an efficient protocol to enhance the PEC water splitting of silicon-based materials. PMID:27461187

  6. Electrochemically reduced graphene oxide on silicon nanowire arrays for enhanced photoelectrochemical hydrogen evolution.

    PubMed

    Meng, Huan; Fan, Ke; Low, Jingxiang; Yu, Jiaguo

    2016-09-21

    Photoelectrochemical (PEC) water splitting into hydrogen and oxygen by sunlight is a promising approach to solve energy and environmental problems. In this work, silicon nanowire arrays (SiNWs) photocathodes decorated with reduced graphene oxide (rGO) for PEC water splitting were successfully prepared by a flexible and scalable electrochemical reduction method. The SiNWs photocathode with the optimized rGO decoration (SiNWs/rGO20) shows an enhanced activity with a much higher photocurrent density and significantly positive shift of onset potential compared to the bare SiNWs arrays for the hydrogen evolution reaction (HER). The enhanced PEC activity is ascribed to the high electrical conductivity of rGO and improved separation of the photogenerated charge carriers. This work not only demonstrates a facile, rapid and tunable electrochemical reduction method to produce rGO, but also exhibits an efficient protocol to enhance the PEC water splitting of silicon-based materials.

  7. Preparation of a silicon heterojunction photodetector from colloidal indium oxide nanoparticles

    NASA Astrophysics Data System (ADS)

    Ismail, Raid A.; Ali, Abdulrahman K.; Hassoon, Khaleel I.

    2013-10-01

    A colloidal indium oxide (In2O3) nanoparticles (NPs) were synthesized by using a Q-switched Nd:YAG laser ablation of indium target in water at room temperature. Optical absorption and x-ray diffraction (XRD) investigation of the prepared samples confirm the formation of In2O3 NPs. A solution-processed silicon heterojunction photodetector, fabricated by drop cast film of colloidal In2O3 NPs onto n-type single crystal silicon wafer, is demonstrated. I-V characteristics of In2O3 NPs/Si heterojunction under dark and illumination conditions confirmed the rectifying behavior and the good photoresponse. The built-in-voltage was determined from the C-V measurements which revealed an abrupt junction.

  8. Monte Carlo study of interfacial silicon suboxide layers and oxidation kinetics

    NASA Astrophysics Data System (ADS)

    da Silva, E. F.; de Vasconcelos, E. A.; Stošić, B. D.

    2002-05-01

    A simple simulation scheme that simultaneously describes the growth kinetics of SiO 2 films at the nanometer scale and the SiO x/Si interface dynamics (its extent, and spatial/temporal evolution) is presented. The simulation successfully applies to experimental data in the region above and below 10 nm, reproduces the Deal and Grove linear-parabolic law and the oxide growth rate enhancement in the very thin film regime (the so-called anomalous region). According to the simulation, the oxidation is governed mainly by two processes: (a) the formation of a transition suboxide layer and (b) its subsequent drift towards the silicon bulk. We found that it is the superposition of these two processes that produces the crossover from the anomalous oxidation region behavior to the linear-parabolic law.

  9. Oxidative stress in bacteria (Pseudomonas putida) exposed to nanostructures of silicon carbide.

    PubMed

    Borkowski, Andrzej; Szala, Mateusz; Kowalczyk, Paweł; Cłapa, Tomasz; Narożna, Dorota; Selwet, Marek

    2015-09-01

    Silicon carbide (SiC) nanostructures produced by combustion synthesis can cause oxidative stress in the bacterium Pseudomonas putida. The results of this study showed that SiC nanostructures damaged the cell membrane, which can lead to oxidative stress in living cells and to the loss of cell viability. As a reference, micrometric SiC was also used, which did not exhibit toxicity toward cells. Oxidative stress was studied by analyzing the activity of peroxidases, and the expression of the glucose-6-phosphate dehydrogenase gene (zwf1) using real-time PCR and northern blot techniques. Damage to nucleic acid was studied by isolating and hydrolyzing plasmids with the formamidopyrimidine [fapy]-DNA glycosylase (also known as 8-oxoguanine DNA glycosylase) (Fpg), which is able to detect damaged DNA. The level of viable microbial cells was investigated by propidium iodide and acridine orange staining.

  10. Near-theoretical fracture strengths in native and oxidized silicon nanowires.

    PubMed

    DelRio, Frank W; White, Ryan M; Krylyuk, Sergiy; Davydov, Albert V; Friedman, Lawrence H; Cook, Robert F

    2016-08-01

    In this letter, fracture strengths σ f of native and oxidized silicon nanowires (SiNWs) were determined via atomic force microscopy bending experiments and nonlinear finite element analysis. In the native SiNWs, σ f in the Si was comparable to the theoretical strength of Si〈111〉, ≈22 GPa. In the oxidized SiNWs, σ f in the SiO2 was comparable to the theoretical strength of SiO2, ≈6 to 12 GPa. The results indicate a change in the failure mechanism between native SiNWs, in which fracture originated via inter-atomic bond breaking or atomic-scale defects in the Si, and oxidized SiNWs, in which fracture initiated from surface roughness or nano-scale defects in the SiO2.

  11. Near-theoretical fracture strengths in native and oxidized silicon nanowires

    NASA Astrophysics Data System (ADS)

    DelRio, Frank W.; White, Ryan M.; Krylyuk, Sergiy; Davydov, Albert V.; Friedman, Lawrence H.; Cook, Robert F.

    2016-08-01

    In this letter, fracture strengths σ f of native and oxidized silicon nanowires (SiNWs) were determined via atomic force microscopy bending experiments and nonlinear finite element analysis. In the native SiNWs, σ f in the Si was comparable to the theoretical strength of Si<111>, ≈22 GPa. In the oxidized SiNWs, σ f in the SiO2 was comparable to the theoretical strength of SiO2, ≈6 to 12 GPa. The results indicate a change in the failure mechanism between native SiNWs, in which fracture originated via inter-atomic bond breaking or atomic-scale defects in the Si, and oxidized SiNWs, in which fracture initiated from surface roughness or nano-scale defects in the SiO2.

  12. Enhanced electron-hole droplet emission from surface-oxidized silicon photonic crystal nanocavities.

    PubMed

    Sumikura, Hisashi; Kuramochi, Eiichi; Taniyama, Hideaki; Notomi, Masaya

    2016-01-25

    We have observed electron-hole droplet (EHD) emission enhanced by silicon photonic crystal (Si PhC) nanocavities with a surface oxide. The EHD is employed as a massive emitter that remains inside the nanocavity to achieve efficient cavity-emitter coupling. Time-resolved emission measurements demonstrate that the surface oxide greatly reduces the nonradiative annihilation of the EHDs and maintains them in the PhC nanocavities. It is found that the surface-oxidized Si PhC nanocavity enhances EHD emission in addition to the Purcell enhancement of the resonant cavity, which will contribute to works on Si light emission and the cavity quantum electrodynamics of electron-hole condensates. PMID:26832491

  13. Fabrication and evaluation of series-triple quantum dots by thermal oxidation of silicon nanowire

    SciTech Connect

    Uchida, Takafumi Jo, Mingyu; Tsurumaki-Fukuchi, Atsushi; Arita, Masashi; Takahashi, Yasuo; Fujiwara, Akira

    2015-11-15

    Series-connected triple quantum dots were fabricated by a simple two-step oxidation technique using the pattern-dependent oxidation of a silicon nanowire and an additional oxidation of the nanowire through the gap of the fine gates attached to the nanowire. The characteristics of multi-dot single-electron devices are obtained. The formation of each quantum dot beneath an attached gate is confirmed by analyzing the electrical characteristics and by evaluating the gate capacitances between all pairings of gates and quantum dots. Because the gate electrode is automatically attached to each dot, the device structure benefits from scalability. This technique promises integrability of multiple quantum dots with individual control gates.

  14. Self-limiting and complete oxidation of silicon nanostructures produced by laser ablation in water

    NASA Astrophysics Data System (ADS)

    Vaccaro, L.; Popescu, R.; Messina, F.; Camarda, P.; Schneider, R.; Gerthsen, D.; Gelardi, F. M.; Cannas, M.

    2016-07-01

    Oxidized Silicon nanomaterials produced by 1064 nm pulsed laser ablation in deionized water are investigated. High-resolution transmission electron microscopy coupled with energy dispersive X-ray spectroscopy allows to characterize the structural and chemical properties at a sub-nanometric scale. This analysis clarifies that laser ablation induces both self-limiting and complete oxidation processes which produce polycrystalline Si surrounded by a layer of SiO2 and amorphous fully oxidized SiO2, respectively. These nanostructures exhibit a composite luminescence spectrum which is investigated by time-resolved spectroscopy with a tunable laser excitation. The origin of the observed luminescence bands agrees with the two structural typologies: Si nanocrystals emit a μs-decaying red band; defects of SiO2 give rise to a ns-decaying UV band and two overlapping blue bands with lifetime in the ns and ms timescale.

  15. Effect of gate oxide thickness on the radiation hardness of silicon-gate CMOS

    SciTech Connect

    Nordstrom, T.V.; Gibbon, C.F.

    1981-01-01

    Significant improvements have been made in the radiation hardness of silicon-gate CMOS by reducing the gate oxide thickness. The device studied is an 8-bit arithmetic logic unit designed with Sandia's Expanded Linear Array (ELA) standard cells. Devices with gate oxide thicknesses of 400, 570 (standard), and 700 A were fabricated. Irradiations were done at a dose rate of 2 x 10/sup 6/ rads (Si) per hour. N- and P-channel maximum threshold shifts were reduced by 0.3 and 1.2 volts, respectively, for the thinnest oxide. Approximately, a linear relationship is found for threshold shift versus thickness. The functional radiation hardness of the full integrated circuit was also measured.

  16. Oxidation of silicon nitride sintered with rare-earth oxide additions

    NASA Technical Reports Server (NTRS)

    Mieskowski, D. M.; Sanders, W. A.

    1985-01-01

    The effects of rare-earth oxide additions on the oxidation of sintered Si3N4 were examined. Insignificant oxidation occurred at 700 and 1000 C, with no evidence of phase instability. At 1370 C, the oxidation rate was lowest for Y2O3 and increased for additions of La2O3, Sm2O3, and CeO2, in that order. Data obtained from X-ray diffraction, electron microprobe analysis, and scanning electron microscopy indicate that oxidation occurs via diffusion of cationic species from Si3N4 grain boundaries.

  17. A Modified Oxidative Refinement Process for Removing Boron from Molten Silicon Under Enhanced Electromagnetic Force.

    PubMed

    Lee, Jun-Kyu; Lee, Jin-Seok; Jang, Bo-Yun; Kim, Joon-Soo; Ahn, Young-Soo; Kang, Gi-Hwan; Cho, Churl-Hee

    2015-11-01

    The removal of boron is one of the main challenges in the purification of metallurgical grade silicon destined for low-cost photovoltaic applications. However, boron is very difficult to remove in its elemental form due to its large segregation coefficient in silicon and its low vapor pressure. The removal of boron by slag treatment is today regarded as a highly promising method, but its refining efficiency is relatively low. Also, the reduction of boron by plasma treatment exhibits a high refining efficiency, but the processing cost is high due to the large amount of electricity consumed by the process. In this regard, the use of an oxidizing reactive gas in the refinement process offers some advantages both in terms of low energy consumption and promising refinement rates. Boron can be extracted in various gaseous forms as B(x)O(y) and/or B(x)H(z)O(y) phases, but the vapor pressure of B(x)H(z)O(y) is much greater than that of the other specie at a temperature of 1700 K. The present study reports a modified oxidative refining method designed to enhance the vaporization of boron as B(x)H(z)O(y) by blowing gaseous water onto the silicon melt in a segmented crucible to enhance the electromagnetic force, whereby the processing cost can be dramatically reduced due to the use of a reusable quartz crucible in a graphite crucible. An initial boron content of 13 ppm in the metallurgical grade silicon was significantly decreased to 0.3 ppm by the employment of 1.7SLM Ar + 100 ml/h H2O. Also, a mechanism capable of reducing boron based on thermodynamic considerations is proposed.

  18. Composition, process, and apparatus, for removal of water and silicon mu-oxides from chlorosilanes

    DOEpatents

    Tom, Glenn M.; McManus, James V.

    1991-10-15

    A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4"y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 to 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.

  19. Process for removal of water and silicon mu-oxides from chlorosilanes

    DOEpatents

    Tom, Glenn M.; McManus, James V.

    1992-03-10

    A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value of from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 to 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.

  20. A Modified Oxidative Refinement Process for Removing Boron from Molten Silicon Under Enhanced Electromagnetic Force.

    PubMed

    Lee, Jun-Kyu; Lee, Jin-Seok; Jang, Bo-Yun; Kim, Joon-Soo; Ahn, Young-Soo; Kang, Gi-Hwan; Cho, Churl-Hee

    2015-11-01

    The removal of boron is one of the main challenges in the purification of metallurgical grade silicon destined for low-cost photovoltaic applications. However, boron is very difficult to remove in its elemental form due to its large segregation coefficient in silicon and its low vapor pressure. The removal of boron by slag treatment is today regarded as a highly promising method, but its refining efficiency is relatively low. Also, the reduction of boron by plasma treatment exhibits a high refining efficiency, but the processing cost is high due to the large amount of electricity consumed by the process. In this regard, the use of an oxidizing reactive gas in the refinement process offers some advantages both in terms of low energy consumption and promising refinement rates. Boron can be extracted in various gaseous forms as B(x)O(y) and/or B(x)H(z)O(y) phases, but the vapor pressure of B(x)H(z)O(y) is much greater than that of the other specie at a temperature of 1700 K. The present study reports a modified oxidative refining method designed to enhance the vaporization of boron as B(x)H(z)O(y) by blowing gaseous water onto the silicon melt in a segmented crucible to enhance the electromagnetic force, whereby the processing cost can be dramatically reduced due to the use of a reusable quartz crucible in a graphite crucible. An initial boron content of 13 ppm in the metallurgical grade silicon was significantly decreased to 0.3 ppm by the employment of 1.7SLM Ar + 100 ml/h H2O. Also, a mechanism capable of reducing boron based on thermodynamic considerations is proposed. PMID:26726550

  1. Interaction of silicon-based quantum dots with gibel carp liver: oxidative and structural modifications

    NASA Astrophysics Data System (ADS)

    Stanca, Loredana; Petrache, Sorina Nicoleta; Serban, Andreea Iren; Staicu, Andrea Cristina; Sima, Cornelia; Munteanu, Maria Cristina; Zărnescu, Otilia; Dinu, Diana; Dinischiotu, Anca

    2013-05-01

    Quantum dots (QDs) interaction with living organisms is of central interest due to their various biological and medical applications. One of the most important mechanisms proposed for various silicon nanoparticle-mediated toxicity is oxidative stress. We investigated the basic processes of cellular damage by oxidative stress and tissue injury following QD accumulation in the gibel carp liver after intraperitoneal injection of a single dose of 2 mg/kg body weight Si/SiO2 QDs after 1, 3, and 7 days from their administration. QDs gradual accumulation was highlighted by fluorescence microscopy, and subsequent histological changes in the hepatic tissue were noted. After 1 and 3 days, QD-treated fish showed an increased number of macrophage clusters and fibrosis, while hepatocyte basophilia and isolated hepatolytic microlesions were observed only after substantial QDs accumulation in the liver parenchyma, at 7 days after IP injection. Induction of oxidative stress in fish liver was revealed by the formation of malondialdehyde and advanced oxidation protein products, as well as a decrease in protein thiol groups and reduced glutathione levels. The liver enzymatic antioxidant defense was modulated to maintain the redox status in response to the changes initiated by Si/SiO2 QDs. So, catalase and glutathione peroxidase activities were upregulated starting from the first day after injection, while the activity of superoxide dismutase increased only after 7 days. The oxidative damage that still occurred may impair the activity of more sensitive enzymes. A significant inhibition in glucose-6-phosphate dehydrogenase and glutathione-S-transferase activity was noted, while glutathione reductase remained unaltered. Taking into account that the reduced glutathione level had a deep decline and the level of lipid peroxidation products remained highly increased in the time interval we studied, it appears that the liver antioxidant defense of Carassius gibelio does not counteract the

  2. Bismuth ochers from San Diego Co., California

    USGS Publications Warehouse

    Schaller, W.T.

    1911-01-01

    The chief points brought out in this paper may be briefly summarized as follows: (1) The existence of natural Bi2O3 has not been established. (2) Natural bismite or bismuth ocher, when pure, is more probably a bismuth hydroxide. (3) The bismuth ochers from San Diego County, California, are either a bismuth hydroxide or bismuth vanadate, pucherite, or mixtures of these two. (4) Pucherite has been found noncrystallin and determined for the first time in the United States.

  3. Hydrogen passivation of silicon(100) used as templates for low-temperature epitaxy and oxidation

    NASA Astrophysics Data System (ADS)

    Atluri, Vasudeva Prasad

    Epitaxial growth, oxidation and ohmic contacts require surfaces as free as possible of physical defects and chemical contaminants, especially, oxygen and hydrocarbons. Wet chemical cleaning typically involves a RCA clean to remove contaminants by stripping the native oxide and regrowing a chemical oxide with only trace levels of carbon and metallic impurities. Low temperature epitaxy, T<800sp° C, limits the thermal budget for the desorption of impurities and surface oxides, and can be performed on processed structures. But, silicon dioxide cannot be desorbed at temperatures lower than 800sp°C. Recently, hydrogen passivation of Si(111) has been reported to produce stable and ordered surfaces at low temperatures. Hydrogen can then be desorbed between 200sp°C and 600sp°C prior to deposition. In this work, Si(100) is passivated via a solution of hydrofluoric acid in alcohol (methanol, ethanol, or isopropyl alcohol) with HF concentrations between 0.5 to 10%. A rinse in water or alcohol is performed after etching to remove excess fluorine. This work investigates wet chemical cleaning of Si(100) to produce ordered, hydrogen-terminated, oxygen- and carbon-free surfaces to be used as templates for low temperature epitaxial growth and rapid thermal oxidation. Ion beam analysis, Tapping mode atomic force microscopy, Fourier transform infrared spectroscopy, Secondary ion mass spectroscopy, Chemical etching, Capacitance-voltage measurements and Ellipsometry are used to measure, at the surface and interface, impurities concentration, residual disorder, crystalline order, surface topography, roughness, chemical composition, defects density, electrical characteristics, thickness, and refractive index as a function of cleaning conditions for homoepitaxial silicon growth and oxidation. The wetting characteristics of the Si(100) surfaces are measured with a tilting plate technique. Different materials are analyzed by ion beam analysis for use as hydrogen standards in elastic

  4. Silicon improves seed germination and alleviates oxidative stress of bud seedlings in tomato under water deficit stress.

    PubMed

    Shi, Yu; Zhang, Yi; Yao, Hejin; Wu, Jiawen; Sun, Hao; Gong, Haijun

    2014-05-01

    The beneficial effects of silicon on plant growth and development under drought have been widely reported. However, little information is available on the effects of silicon on seed germination under drought. In this work, the effects of exogenous silicon (0.5 mM) on the seed germination and tolerance performance of tomato (Solanum lycopersicum L.) bud seedlings under water deficit stress simulated by 10% (w/v) polyethylene glycol (PEG-6000) were investigated in four cultivars ('Jinpengchaoguan', 'Zhongza No.9', 'Houpi L402' and 'Oubao318'). The results showed that the seed germination percentage was notably decreased in the four cultivars under water stress, and it was significantly improved by added silicon. Compared with the non-silicon treatment, silicon addition increased the activities of superoxide dismutase (SOD) and catalase (CAT), and decreased the production of superoxide anion (O2·) and hydrogen peroxide (H2O2) in the radicles of bud seedlings under water stress. Addition of silicon decreased the total phenol concentrations in radicles under water stress, which might contribute to the decrease of peroxidase (POD) activity, as observed in the in vivo and in vitro experiments. The decrease of POD activity might contribute to a less accumulation of hydroxyl radical (·OH) under water stress. Silicon addition also decreased the concentrations of malondialdehyde (MDA) in the radicles under stress, indicating decreased lipid peroxidation. These results suggest that exogenous silicon could improve seed germination and alleviate oxidative stress to bud seedling of tomato by enhancing antioxidant defense. The positive effects of silicon observed in a silicon-excluder also suggest the active involvement of silicon in biochemical processes in plants.

  5. ADSORPTION-BISMUTH PHOSPHATE METHOD FOR SEPARATING PLUTONIUM

    DOEpatents

    Russell, E.R.; Adamson, A.W.; Boyd, G.E.

    1960-06-28

    A process is given for separating plutonium from uranium and fission products. Plutonium and uranium are adsorbed by a cation exchange resin, plutonium is eluted from the adsorbent, and then, after oxidation to the hexavalent state, the plutonium is contacted with a bismuth phosphate carrier precipitate.

  6. Band offsets of a ruthenium gate on ultrathin high-{kappa} oxide films on silicon

    SciTech Connect

    Rangan, Sylvie; Bersch, Eric; Bartynski, Robert Allen; Garfunkel, Eric; Vescovo, Elio

    2009-02-15

    Valence-band and conduction-band edges of ultrathin oxides (SiO{sub 2}, HfO{sub 2}, Hf{sub 0.7}Si{sub 0.3}O{sub 2}, and Al{sub 2}O{sub 3} grown on silicon) and their shifts upon sequential metallization with ruthenium have been measured using synchrotron-radiation-excited x-ray, ultraviolet, and inverse photoemissions. From these techniques, the offsets between the valence-band and conduction-band edges of the oxides, and the ruthenium metal gate Fermi edge have been directly measured. In addition the core levels of the oxides and the ruthenium have been characterized. Upon deposition, Ru remains metallic and no chemical alteration of the underlying oxide gates, or interfacial SiO{sub 2} in the case of the high-{kappa} thin films, can be detected. However a clear shift of the band edges is measured for all samples due to the creation of an interface dipole at the ruthenium-oxide interface. Using the energy gap, the electron affinity of the oxides, and the ruthenium work function that have been directly measured on these samples, the experimental band offsets are compared to those predicted by the induced gap states model.

  7. The influence of oxidation properties on the electron emission characteristics of porous silicon

    NASA Astrophysics Data System (ADS)

    He, Li; Zhang, Xiaoning; Wang, Wenjiang; Wei, Haicheng

    2016-09-01

    In order to investigate the influence of oxidation properties such as oxygen content and its distribution gradient on the electron emission characteristics of porous silicon (PS) emitters, emitters with PS thickness of 8 μm, 5 μm, and 3 μm were prepared and then oxidized by electrochemical oxidation (ECO) and ECO-RTO (rapid thermal oxidation) to get different oxidation properties. The experimental results indicated that the emission current density, efficiency, and stability of the PS emitters are mainly determined by oxidation properties. The higher oxygen content and the smaller oxygen distribution gradient in the PS layer, the larger emission current density and efficiency we noted. The most favorable results occurred for the PS emitter with the smallest oxygen distribution gradient and the highest level of oxygen content, with an emission current density of 212.25 μA/cm2 and efficiency of 59.21‰. Additionally, it also demonstrates that thick PS layer benefits to the emission stability due to its longer electron acceleration tunnel. The FN fitting plots indicated that the effective emission areas of PS emitters can be enlarged and electron emission thresholds is decreased because of the higher oxygen content and smaller distribution gradient, which were approved by the optical micrographs of top electrode of PS emitters before and after electron emission.

  8. High Mobility and Stability of Thin-Film Transistors Using Silicon-Doped Amorphous Indium Tin Oxide Semiconductors

    NASA Astrophysics Data System (ADS)

    Seo, T. W.; Kim, Hyun-Suk; Lee, Kwang-Ho; Chung, Kwun-Bum; Park, Jin-Seong

    2014-09-01

    We report the fabrication of high-performance thin-film transistors (TFTs) with an amorphous silicon indium tin oxide ( a-SITO) channel, which was deposited by cosputtering a silicon dioxide and an indium tin oxide target. The effect of the silicon doping on the device performance and stability of the a-SITO TFTs was investigated. The field-effect mobility and stability under positive bias stress of the a-SITO TFTs with optimized Si content (0.22 at.% Si) dramatically improved to 28.7 cm2/Vs and 1.5 V shift of threshold voltage, respectively, compared with the values (0.72 cm2/Vs and 8.9 V shift) for a-SITO TFTs with 4.22 at.% Si. The role of silicon in a-SITO TFTs is discussed based on various physical and chemical analyses, including x-ray absorption spectroscopy, x-ray photoelectron spectroscopy, and spectroscopic ellipsometry measurements.

  9. In situ transmission electron microscopy probing of native oxide and artificial layers on silicon nanoparticles for lithium ion batteries.

    PubMed

    He, Yang; Piper, Daniela Molina; Gu, Meng; Travis, Jonathan J; George, Steven M; Lee, Se-Hee; Genc, Arda; Pullan, Lee; Liu, Jun; Mao, Scott X; Zhang, Ji-Guang; Ban, Chunmei; Wang, Chongmin

    2014-11-25

    Surface modification of silicon nanoparticles via molecular layer deposition (MLD) has been recently proved to be an effective way for dramatically enhancing the cyclic performance in lithium ion batteries. However, the fundamental mechanism of how this thin layer of coating functions is not known, which is complicated by the inevitable presence of native oxide of several nanometers on the silicon nanoparticle. Using in situ TEM, we probed in detail the structural and chemical evolution of both uncoated and coated silicon particles upon cyclic lithiation/delithation. We discovered that upon initial lithiation, the native oxide layer converts to crystalline Li2O islands, which essentially increases the impedance on the particle, resulting in ineffective lithiation/delithiation and therefore low Coulombic efficiency. In contrast, the alucone MLD-coated particles show extremely fast, thorough, and highly reversible lithiation behaviors, which are clarified to be associated with the mechanical flexibility and fast Li(+)/e(-) conductivity of the alucone coating. Surprisingly, the alucone MLD coating process chemically changes the silicon surface, essentially removing the native oxide layer, and therefore mitigates side reactions and detrimental effects of the native oxide. This study provides a vivid picture of how the MLD coating works to enhance the Coulombic efficiency, preserves capacity, and clarifies the role of the native oxide on silicon nanoparticles during cyclic lithiation and delithiation. More broadly, this work also demonstrates that the effect of the subtle chemical modification of the surface during the coating process may be of equal importance to the coating layer itself.

  10. In-Situ Transmission Electron Microscopy Probing of Native Oxide and Artificial Layers on Silicon Nanoparticles for Lithium Ion Batteries

    SciTech Connect

    He, Yang; Piper, Daniela M.; Gu, Meng; Travis, Jonathan J.; George, Steven M.; Lee, Se-Hee; Genc, Arda; Pullan, Lee; Liu, Jun; Mao, Scott X.; Zhang, Jiguang; Ban, Chunmei; Wang, Chong M.

    2014-11-25

    Surface modification of silicon nanoparticle via molecular layer deposition (MLD) has been recently proved to be an effective way for dramatically enhancing the cyclic performance in lithium ion batteries. However, the fundamental mechanism as how this thin layer of coating function is not known, which is even complicated by the inevitable presence of native oxide of several nanometers on the silicon nanoparticle. Using in-situ TEM, we probed in detail the structural and chemical evolution of both uncoated and coated silicon particles upon cyclic lithiation/delithation. We discovered that upon initial lithiation, the native oxide layer converts to crystalline Li2O islands, which essentially increases the impedance on the particle, resulting in ineffective lithiation/delithiation, and therefore low coulombic efficiency. In contrast, the alucone MLD coated particles show extremely fast, thorough and highly reversible lithiation behaviors, which are clarified to be associated with the mechanical flexibility and fast Li+/e- conductivity of the alucone coating. Surprisingly, the alucone MLD coating process chemically changes the silicon surface, essentially removing the native oxide layer and therefore mitigates side reaction and detrimental effects of the native oxide. This study provides a vivid picture of how the MLD coating works to enhance the coulombic efficiency and preserve capacity and clarifies the role of the native oxide on silicon nanoparticles during cyclic lithiation and delithiation. More broadly, this work also demonstrated that the effect of the subtle chemical modification of the surface during the coating process may be of equal importance as the coating layer itself.

  11. Characteristics of electro-refractive modulating based on Graphene-Oxide-Silicon waveguide.

    PubMed

    Xu, Chao; Jin, Yichang; Yang, Longzhi; Yang, Jianyi; Jiang, Xiaoqing

    2012-09-24

    Graphene has attracted a high level of research interest because of its outstanding electronic transport properties and optical properties. Based on the Kubo formalism and the Maxwell equations, it's demonstrated that the optical conductivity of graphene can be controlled through the applied voltage. And we find that the graphene-oxide-silicon (GOS) based waveguide can be made into either the electro-absorptive or electron-refractive modulators. Using graphene as the active medium, we present a new electro-refractive Mach-Zender interferometer based on the GOS structure. This new GOS-based electron-refractive modulation mechanism can enable novel architectures for on-chip optical communications. PMID:23037388

  12. Ultrasensitive food toxin biosensor using frequency based signals of silicon oxide nanoporous structure

    NASA Astrophysics Data System (ADS)

    Ghosh, H.; RoyChaudhuri, C.

    2013-06-01

    We report an electrochemically fabricated silicon oxide nanoporous structure for ultrasensitive detection of AfB1 in food by shift in peak frequency corresponding to maximum sensitivity. It has been observed that the impedance sensitivity changes from 19% to 40% (which is only twice) where as the peak frequency shifts from 500 Hz to 50 kHz, for a change in concentration from 1 fg/ml to 1 pg/ml. This has been attributed to the combined effect of the significant pore narrowing with increasing AfB1 concentration and the opposing nature of impedance change within the nanopores and the conducting substrate immediately below the nanoporous layer.

  13. Epitaxial ferromagnetic oxide thin films on silicon with atomically sharp interfaces

    SciTech Connect

    Coux, P. de; Bachelet, R.; Fontcuberta, J.; Sánchez, F.; Warot-Fonrose, B.; Skumryev, V.; Lupina, L.; Niu, G.; Schroeder, T.

    2014-07-07

    A bottleneck in the integration of functional oxides with silicon, either directly grown or using a buffer, is the usual formation of an amorphous interfacial layer. Here, we demonstrate that ferromagnetic CoFe{sub 2}O{sub 4} films can be grown epitaxially on Si(111) using a Y{sub 2}O{sub 3} buffer layer, and remarkably the Y{sub 2}O{sub 3}/Si(111) interface is stable and remains atomically sharp. CoFe{sub 2}O{sub 4} films present high crystal quality and high saturation magnetization.

  14. Electronic detection of surface plasmon polaritons by metal-oxide-silicon capacitor

    NASA Astrophysics Data System (ADS)

    Peale, Robert E.; Smith, Evan; Smith, Christian W.; Khalilzadeh-Rezaie, Farnood; Ishigami, Masa; Nader, Nima; Vangala, Shiva; Cleary, Justin W.

    2016-09-01

    An electronic detector of surface plasmon polaritons (SPPs) is reported. SPPs optically excited on a metal surface using a prism coupler are detected by using a close-coupled metal-oxide-silicon (MOS) capacitor. Incidence-angle dependence is explained by Fresnel transmittance calculations, which also are used to investigate the dependence of photo-response on structure dimensions. Electrodynamic simulations agree with theory and experiment and additionally provide spatial intensity distributions on and off the SPP excitation resonance. Experimental dependence of the photoresponse on substrate carrier type, carrier concentration, and back-contact biasing is qualitatively explained by simple theory of MOS capacitors.

  15. Using nanopillars of silicon oxide as a versatile platform for visualizing a selective immunosorbent

    NASA Astrophysics Data System (ADS)

    Chen, Jem-Kun; Zhou, Gang-Yan; Huang, Chih-Feng; Ko, Fu-Hsiang

    2013-06-01

    In this study, we fabricated nanopillar arrays of silicon oxide for use as two-dimensional periodic relief gratings (2DPRGs) on Si surfaces. We deposited antibodies onto the pillar surfaces of 2DPRGs modified with protein G to obtain optical detectors that were specific for the targeted antigen; the antigen units that filled the spaces between the nanopillars of the 2DPRG lead to a dramatic change in the pillar scale. The effective refractive index (neff) of the 2DPRGs was related to the pillar scale of the 2DPRG; after coupling of the antigen, a color change from pure green to orange was observable.

  16. Oxidation behavior in reaction-bonded aluminum-silicon alloy/alumina powder compacts

    SciTech Connect

    Yokota, S.H.

    1992-12-01

    Goal of this research is to determine the feasibility of producing low-shrinkage mullite/alumina composites by applying the reaction-bonded alumina (RBAO) process to an aluminum-silicon alloy/alumina system. Mirostructural and compositional changes during heat treatment were studied by removing samples from the furnace at different steps in the heating schedule and then using optical and scanning electron microscopy, EDS and XRD to characterize the powder compacts. Results suggest that the oxidation behavior of the alloy compact is different from the model proposed for the pure Al/alumina system.

  17. The electroluminescence mechanism of Er³⁺ in different silicon oxide and silicon nitride environments

    SciTech Connect

    Rebohle, L. Wutzler, R.; Braun, M.; Helm, M.; Skorupa, W.; Berencén, Y.; Ramírez, J. M.; Garrido, B.; Hiller, D.

    2014-09-28

    Rare earth doped metal-oxide-semiconductor (MOS) structures are of great interest for Si-based light emission. However, several physical limitations make it difficult to achieve the performance of light emitters based on compound semiconductors. To address this point, in this work the electroluminescence (EL) excitation and quenching mechanism of Er-implanted MOS structures with different designs of the dielectric stack are investigated. The devices usually consist of an injection layer made of SiO₂ and an Er-implanted layer made of SiO₂, Si-rich SiO₂, silicon nitride, or Si-rich silicon nitride. All structures implanted with Er show intense EL around 1540 nm with EL power efficiencies in the order of 2 × 10⁻³ (for SiO₂:Er) or 2 × 10⁻⁴(all other matrices) for lower current densities. The EL is excited by the impact of hot electrons with an excitation cross section in the range of 0.5–1.5 × 10⁻¹⁵cm⁻². Whereas the fraction of potentially excitable Er ions in SiO₂ can reach values up to 50%, five times lower values were observed for other matrices. The decrease of the EL decay time for devices with Si-rich SiO₂ or Si nitride compared to SiO₂ as host matrix implies an increase of the number of defects adding additional non-radiative de-excitation paths for Er³⁺. For all investigated devices, EL quenching cross sections in the 10⁻²⁰ cm² range and charge-to-breakdown values in the range of 1–10 C cm⁻² were measured. For the present design with a SiO₂ acceleration layer, thickness reduction and the use of different host matrices did not improve the EL power efficiency or the operation lifetime, but strongly lowered the operation voltage needed to achieve intense EL.

  18. The oxidized porous silicon vacuum microtriode: A revolutionary new type of field emission array

    SciTech Connect

    Smith, D.D.; Demroff, H.P.; Elliott, T.S.; Faber, J.S.; Lee, B.; Mazumdar, T.; McIntyre, P.M.; Trost, H.J.; Pang, Y.

    1997-08-01

    Yue began studying porous silicon-based vacuum microelectronic devices i n1990. Results from a device he dubbed the Oxidized Porous Silicon Field Emission Diode (OPSFED) showed that porous silicon (PS) offered an attractive alternative to standard field emission devices. Emission sites are reduced to near-atomic dimensions and site density is increased by six orders of magnitude. Yue, and later Madduri extracted electrons into the vacuum in a diode configuration, but no attempt to build a triode device had ever been successful. Using a novel metallization technique developed by Dr. R.C. Jaklevic et al. for use in STM imaging, the authors have successfully fabricated the first working PS-based vacuum microtriodes. Results are extremely encouraging. Collector currents up to 700 {micro}A were extracted across {approximately}3mm of vacuum with a pulsed DC gate bias of less than 20V. Simultaneous measurement of the gate current showed current densities to 700A/cm{sup 2}. Modulation of the emission to 5MH: was observed. Fowler-Nordheim plots show a slight curvature, as would be expected from extremely sharp emission tips, although it is stressed that the electroemissive mechanism is as yet unknown. Fowler-Nordheim plots for OPSFED`s made from the same material show an opposite curvature as predicted for emission from a large number of sites. Density of emitters approach a true two-dimensional limit, and many applications exist if the technology can be matured.

  19. Dependence of photovoltages of spray-deposited indium tin oxide/silicon oxide/silicon junction solar cells on spray solvents

    NASA Astrophysics Data System (ADS)

    Ishida, T.; Kouno, H.; Kobayashi, H.; Nakato, Y.

    1994-05-01

    The photovoltages of spray-deposited indium tin oxide/silicon oxide/n-Si junction solar cells are found to depend strongly on the spray solvents such as methanol, ethanol, ethyl acetate, water, etc. It is also found that the work function of the indium tin oxide (ITO) films is dependent on the spray solvents, and the higher the work function of the ITO films, the larger the photovoltage. X-ray photoelectron spectroscopy (XPS) measurements indicate that an In-OH species, probably formed by reactions of the ITO film with the spray solvents, is present in the deposited film in cases where its work function is high. The resistivity of the ITO films produced using the organic spray solvents is in the range of 2 approx. 4 x 10(sup -4) Omega cm, leading to high fill factors of the solar cells, while that of the films deposited using water as a spray solvent is as high as 1.2 x 10(sup -3) Omega cm, resulting in low fill factors. On the basis of the XPS measurements, the high resistivity of the latter ITO films is attributed to a small amount of tin ions in the films. X-raydiffraction measurements show that the crystal orientation of the ITO films also depends on the spray solvents, indicating that the film formation mechanism varies with the spray solvents. By use of a mixed solvent of methanol:ethyl acetate:water = 5:5:1, the photovoltage becomes the highest, and the conversion efficiency of 14% is achieved.

  20. Evaluation of silicon oxide cleaning using F2/Ar remote plasma processing

    NASA Astrophysics Data System (ADS)

    Kang, S. C.; Hwang, J. Y.; Lee, N.-E.; Joo, K. S.; Bae, G. H.

    2005-07-01

    In this study, chamber cleaning experiments using a F2/Ar remote plasma generated from a toroidal-type remote plasma source were carried out in a plasma enhanced chemical vapor deposition (PECVD) system. The cleaning processes for the various silicon oxide layers, including PE-oxide (deposited by PECVD using SiH4 and N2O), O3-TEOS oxide (deposited by thermal CVD using ozone and TEOS precursor), and BPSG (borophosphosilicate glass), were investigated by varying the various process parameters, such as the F2 gas flow rate, the F2/(F2+Ar) flow ratio, and the cleaning temperature. The species emitted during cleaning were monitored by Fourier transformed infrared spectroscopy and residual gas analysis. Under the current experimental conditions, the cleaning rate of the BPSG was 4.1-5.0 and 3.9-7.3 times higher than that those of the PE-oxide and O3-TEOS oxide layers, respectively, at room temperature and an F2/(F2+Ar) flow ratio of 28.5%-83%. As the cleaning temperature increased from 100 to 350 °C, the cleaning rates of the PE-oxide, O3-TEOS oxide, and BPSG layers were increased by factors of 2.0-3.0, 1.5-2.2, and 3.0-3.4, respectively, at an F2/(F2+Ar) flow ratio of 28%-68%. The F2/(F2+Ar) flow ratio and cleaning temperature were found to be the most critical parameters involved in determining the cleaning rate of the various oxide layers.

  1. Atomic Dynamics and Defect Evolution During Oxygen Precipitation and Oxidation of Silicon

    NASA Astrophysics Data System (ADS)

    Pantelides, Sokrates

    1998-03-01

    The results of first-principles calculations ( based on density functional theory, local-density approximation, pseudopotentials, supercells, and plane waves) provide a basis for a unified account of the atomic-scale processes that underlie oxygen precipitation (enhanced oxygen diffusion, nucleation of "thermal donors", their evolution into electrically inactive SiO2-like precipitates, and the continuing growth of the latter), thin-film oxidation, and the formation of a buried oxide film after O implantation for the formation of Silicon-On-Insulator (SOI) structures. Examination of the energetics and kinetics of the various processes leads to the realization that the intrinsic defect formed during thin-film oxidation and buried-oxide formation is akin to thermal donors, consisting of "frustrated" Si-O bonds (Si atoms bonded to one or more threefold-coordinated O atoms). It is shown that ejection of such frustrated Si atoms underlies the observed emission of Si interstitals in all cases (annealing of thermal donors and further growth of SiO2-like precipitates, thin-film oxidation, and buried-oxide formation). The emission occurs by a synergistic process that eliminates wrong-coordination defects, leaving behind perfectly-bonded structures. These results explain the high quality of Si-SiO2 interfaces and provide a novel family of defects that account for observations that, in addition to the well-known dangling bonds, another defect of unknown identity plays a major role in determining the electrical properties of the Si-SiO2 interface./footnoteE. Cartier and J. H. Stathis, Appl. Phys. Lett. 69, 103 (1996). The same defects are proposed to be the dominant electron traps in buried SOI oxides fabricated by O implantation. The role of H both during oxidation and in subsequent interactions with an Si-SiO2 interface is also elucidated and shown to be in accord with experiments.

  2. CO oxidation catalyzed by silicon carbide (SiC) monolayer: A theoretical study.

    PubMed

    Wang, Nan; Tian, Yu; Zhao, Jingxiang; Jin, Peng

    2016-05-01

    Developing metal-free catalysts for CO oxidation has been a key scientific issue in solving the growing environmental problems caused by CO emission. In this work, the potential of the silicon carbide (SiC) monolayer as a metal-free catalyst for CO oxidation was systematically explored by means of density functional theory (DFT) computations. Our results revealed that CO oxidation reaction can easily proceed on SiC nanosheet, and a three-step mechanism was proposed: (1) the coadsorption of CO and O2 molecules, followed by (2) the formation of the first CO2 molecule, and (3) the recovery of catalyst by a second CO molecule. The last step is the rate-determining one of the whole catalytic reaction with the highest barrier of 0.65eV. Remarkably, larger curvature is found to have a negative effect on the catalytic performance of SiC nanosheet for CO oxidation. Therefore, our results suggested that flat SiC monolayer is a promising metal-free catalyst for CO oxidation.

  3. CO oxidation catalyzed by silicon carbide (SiC) monolayer: A theoretical study.

    PubMed

    Wang, Nan; Tian, Yu; Zhao, Jingxiang; Jin, Peng

    2016-05-01

    Developing metal-free catalysts for CO oxidation has been a key scientific issue in solving the growing environmental problems caused by CO emission. In this work, the potential of the silicon carbide (SiC) monolayer as a metal-free catalyst for CO oxidation was systematically explored by means of density functional theory (DFT) computations. Our results revealed that CO oxidation reaction can easily proceed on SiC nanosheet, and a three-step mechanism was proposed: (1) the coadsorption of CO and O2 molecules, followed by (2) the formation of the first CO2 molecule, and (3) the recovery of catalyst by a second CO molecule. The last step is the rate-determining one of the whole catalytic reaction with the highest barrier of 0.65eV. Remarkably, larger curvature is found to have a negative effect on the catalytic performance of SiC nanosheet for CO oxidation. Therefore, our results suggested that flat SiC monolayer is a promising metal-free catalyst for CO oxidation. PMID:27135172

  4. Impact of Silicon Nanocrystal Oxidation on the Nonmetallic Growth of Carbon Nanotubes.

    PubMed

    Rocks, Conor; Mitra, Somak; Macias-Montero, Manuel; Maguire, Paul; Svrcek, Vladimir; Levchenko, Igor; Ostrikov, Kostya; Mariotti, Davide

    2016-07-27

    Carbon nanotube (CNT) growth has been demonstrated recently using a number of nonmetallic semiconducting and metal oxide nanoparticles, opening up pathways for direct CNT synthesis from a number of more desirable templates without the need for metallic catalysts. However, CNT growth mechanisms using these nonconventional catalysts has been shown to largely differ and reamins a challenging synthesis route. In this contribution we show CNT growth from partially oxidized silicon nanocrystals (Si NCs) that exhibit quantum confinement effects using a microwave plasma enhanced chemical vapor deposition (PECVD) method. On the basis of solvent and a postsynthesis frgamentation process, we show that oxidation of our Si NCs can be easily controlled. We determine experimentally and explain with theoretical simulations that the Si NCs morphology together with a necessary shell oxide of ∼1 nm is vital to allow for the nonmetallic growth of CNTs. On the basis of chemical analysis post-CNT-growth, we give insight into possible mechanisms for CNT nucleation and growth from our partially oxidized Si NCs. This contribution is of significant importance to the improvement of nonmetallic catalysts for CNT growth and the development of Si NC/CNT interfaces. PMID:27362537

  5. Selective growth of α-sexithiophene by using silicon oxides patterns.

    PubMed

    Albonetti, Cristiano; Barbalinardo, Marianna; Milita, Silvia; Cavallini, Massimiliano; Liscio, Fabiola; Moulin, Jean-François; Biscarini, Fabio

    2011-01-01

    A process for fabricating ordered organic films on large area is presented. The process allows growing sexithiophene ultra-thin films at precise locations on patterned Si/SiO(x) substrates by driving the orientation of growth. This process combines the parallel local anodic oxidation of Si/SiO(x) substrates with the selective arrangement of molecular ultra-thin film. The former is used to fabricate silicon oxide arrays of parallel lines of 400 nm in width over an area of 1 cm(2). Selective growth arises from the interplay between kinetic growth parameters and preferential interactions with the patterned surface. The result is an ultra-thin film of organic molecules that is conformal to the features of the fabricated motives.

  6. Selective Growth of α-Sexithiophene by Using Silicon Oxides Patterns

    PubMed Central

    Albonetti, Cristiano; Barbalinardo, Marianna; Milita, Silvia; Cavallini, Massimiliano; Liscio, Fabiola; Moulin, Jean-François; Biscarini, Fabio

    2011-01-01

    A process for fabricating ordered organic films on large area is presented. The process allows growing sexithiophene ultra-thin films at precise locations on patterned Si/SiOx substrates by driving the orientation of growth. This process combines the parallel local anodic oxidation of Si/SiOx substrates with the selective arrangement of molecular ultra-thin film. The former is used to fabricate silicon oxide arrays of parallel lines of 400 nm in width over an area of 1 cm2. Selective growth arises from the interplay between kinetic growth parameters and preferential interactions with the patterned surface. The result is an ultra-thin film of organic molecules that is conformal to the features of the fabricated motives. PMID:22016622

  7. Tribology study of reduced graphene oxide sheets on silicon substrate synthesized via covalent assembly.

    PubMed

    Ou, Junfei; Wang, Jinqing; Liu, Sheng; Mu, Bo; Ren, Junfang; Wang, Honggang; Yang, Shengrong

    2010-10-19

    Reduced graphene oxide (RGO) sheets were covalently assembled onto silicon wafers via a multistep route based on the chemical adsorption and thermal reduction of graphene oxide (GO). The formation and microstructure of RGO were analyzed by X-ray photoelectron spectroscopy (XPS), attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy, Raman spectroscopy, and water contact angle (WCA) measurements. Characterization by atomic force microscopy (AFM) was performed to evaluate the morphology and microtribological behaviors of the samples. Macrotribological performance was tested on a ball-on-plate tribometer. Results show that the assembled RGO possesses good friction reduction and antiwear ability, properties ascribed to its intrinsic structure, that is, the covalent bonding to the substrate and self-lubricating property of RGO.

  8. High k nanophase zinc oxide on biomimetic silicon nanotip array as supercapacitors.

    PubMed

    Han, Hsieh-Cheng; Chong, Cheong-Wei; Wang, Sheng-Bo; Heh, Dawei; Tseng, Chi-Ang; Huang, Yi-Fan; Chattopadhyay, Surojit; Chen, Kuei-Hsien; Lin, Chi-Feng; Lee, Jiun-Haw; Chen, Li-Chyong

    2013-04-10

    A 3D trenched-structure metal-insulator-metal (MIM) nanocapacitor array with an ultrahigh equivalent planar capacitance (EPC) of ~300 μF cm(-2) is demonstrated. Zinc oxide (ZnO) and aluminum oxide (Al2O3) bilayer dielectric is deposited on 1 μm high biomimetic silicon nanotip (SiNT) substrate using the atomic layer deposition method. The large EPC is achieved by utilizing the large surface area of the densely packed SiNT (!5 × 10(10) cm(-2)) coated conformally with an ultrahigh dielectric constant of ZnO. The EPC value is 30 times higher than those previously reported in metal-insulator-metal or metal-insulator-semiconductor nanocapacitors using similar porosity dimensions of the support materials.

  9. Charge separation technique for metal-oxide-silicon capacitors in the presence of hydrogen deactivated dopants

    SciTech Connect

    Witczak, Steven C.; Winokur, Peter S.; Lacoe, Ronald C.; Mayer, Donald C.

    2000-06-01

    An improved charge separation technique for metal-oxide-silicon (MOS) capacitors is presented which accounts for the deactivation of substrate dopants by hydrogen at elevated irradiation temperatures or small irradiation biases. Using high-frequency capacitance-voltage measurements, radiation-induced inversion voltage shifts are separated into components due to oxide trapped charge, interface traps, and deactivated dopants, where the latter is computed from a reduction in Si capacitance. In the limit of no radiation-induced dopant deactivation, this approach reduces to the standard midgap charge separation technique used widely for the analysis of room-temperature irradiations. The technique is demonstrated on a p-type MOS capacitor irradiated with {sup 60}Co {gamma} rays at 100 degree sign C and zero bias, where the dopant deactivation is significant.(c) 2000 American Institute of Physics.

  10. Reactive atomization of silicon to form in situ oxide sintering aids

    NASA Astrophysics Data System (ADS)

    Wu, Y.; Zeng, X.; Lavernia, E. J.; Schoenung, J. M.

    1996-08-01

    The present investigation demonstrated the feasibility of using reactive atomization to produce Si powder with in situ oxide sintering aids. With further process optimization, this powder may be an alternative starting material to the conventional, mechanically blended, Si-plus-oxide powder used to produce commercial sintered reaction bonded silicon nitride (SRBSN). In the reactive atomization approach, yttrium and aluminum additives were introduced into silicon metal during induction melting. Reactive atomization was accomplished using a N2-5 pct O2 mixture as the atomization gas. During atomization, oxygen in the atomization gas reacted with Y and Al in the Si melt to produce Y2O3 and Al2O3, which act as in situ sintering aids. The reactive atomized powder demonstrated a Gaussian distribution with a mean diameter of 36 μm. The powder fines (<38 μm) were used to produce cold isostatically pressed compacts that were subsequently reaction bonded and sintered. The results demonstrate that β-Si3N4 formed during reaction bonding and sintering. The density of the SRBSN was 77 pct of theoretical. Transmission electron microscopy (TEM) studies indicated the presence of a glassy phase on the grain boundaries, which is typical in SRBSN and indicative of the presence of the in situ sintering aids. A kinetic model was used to study the influence of processing parameters, such as droplet temperature and oxygen partial pressure, on the kinetics of oxide formation during reactive atomization. The results suggest that the volume fraction of oxides increases with increasing droplet temperature and oxygen partial pressure in the atomization gas mixture.

  11. Comparative analysis on surface property in anodic oxidation polishing of reaction-sintered silicon carbide and single-crystal 4H silicon carbide

    NASA Astrophysics Data System (ADS)

    Shen, Xinmin; Tu, Qunzhang; Deng, Hui; Jiang, Guoliang; He, Xiaohui; Liu, Bin; Yamamura, Kazuya

    2016-04-01

    For effective machining of difficult-to-machine materials, such as reaction-sintered silicon carbide (RS-SiC) and single-crystal 4H silicon carbide (4H-SiC), a novel polishing technique named anodic oxidation polishing was proposed, which combined with the anodic oxidation of substrate and slurry polishing of oxide. By scanning electron microscopy/energy-dispersive X-ray spectroscopy (SEM-EDX) observation and atomic force microscopy analysis, both the anodic oxidation behaviors of RS-SiC and 4H-SiC were investigated. Through comparison of the surfaces before and after hydrofluoric acid etching of the oxidized samples by the scanning white light interferometry (SWLI) measurement, the relationships between oxidation depth and oxidation time were obtained, and the calculated oxidation rate for RS-SiC was 5.3 nm/s and that for 4H-SiC was 5.8 nm/s based on the linear Deal-Grove model. Through anodic oxidation polishing of RS-SiC substrate and 4H-SiC substrate, respectively, the surface roughness rms obtained by SWLI was improved to 2.103 nm for RS-SiC and to 0.892 nm for 4H-SiC. Experimental results indicate that anodic oxidation polishing is an effective method for the machining of RS-SiC and 4H-SiC samples, which would improve the process level of SiC substrates and promote the application of SiC products in the fields of optics, ceramics, semiconductors, electronics, and so on.

  12. Silicon carbide: A unique platform for metal-oxide-semiconductor physics

    SciTech Connect

    Liu, Gang; Tuttle, Blair R.; Dhar, Sarit

    2015-06-15

    A sustainable energy future requires power electronics that can enable significantly higher efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide (4H-SiC) is one of the most technologically advanced wide bandgap semiconductor that can outperform conventional silicon in terms of power handling, maximum operating temperature, and power conversion efficiency in power modules. While SiC Schottky diode is a mature technology, SiC power Metal Oxide Semiconductor Field Effect Transistors are relatively novel and there is large room for performance improvement. Specifically, major initiatives are under way to improve the inversion channel mobility and gate oxide stability in order to further reduce the on-resistance and enhance the gate reliability. Both problems relate to the defects near the SiO{sub 2}/SiC interface, which have been the focus of intensive studies for more than a decade. Here we review research on the SiC MOS physics and technology, including its brief history, the state-of-art, and the latest progress in this field. We focus on the two main scientific problems, namely, low channel mobility and bias temperature instability. The possible mechanisms behind these issues are discussed at the device physics level as well as the atomic scale, with the support of published physical analysis and theoretical studies results. Some of the most exciting recent progress in interface engineering for improving the channel mobility and fundamental understanding of channel transport is reviewed.

  13. Preparation and Characterization of Ophthalmic Lens Materials Containing Titanium Silicon Oxide and Silver Nanoparticles.

    PubMed

    No, Jung-Won; Kim, Dong-Hyun; Lee, Min-Jae; Kim, Duck-Hyun; Kim, Tae-Hun; Sung, A-Young

    2015-10-01

    Hydrogel ophthalmic lenses containing fluorine-substituted aniline group, titanium silicon oxide nartoparticles, and silver nanoparticles were copolymerized, and the physical and optical properties of the hydrogel lenses were measured. To produce the hydrophilic ophthalmic lenses, the additives were added to the mixture containing HEMA, NVP, MA, EGDMA, and AIBN. The cast mold method was used for the manufacture of the hydrogel ophthalmic lenses, and the produced lenses were completely soaked in a 0.9% NaCl normal saline solution for 24 hours for hydration. The physical properties of the produced macromolecule showed that the water content was 32.5-37.6%, the refractive index was 1.450-1.464, the UV-B transmittance was 0.5-35.2%, and the contact angle was between 56 and 69°. Also, the addition of aniline, titanium silicon oxide, and silver nanoparticles allowed the ophthalmic lenses to block UV. These results show that the produced macromolecule can be used as hydrophilic lenses for ophthalmologic purposes that can block UV. PMID:26726456

  14. Carrier Selective, Passivated Contacts for High Efficiency Silicon Solar Cells based on Transparent Conducting Oxides

    DOE PAGES

    Young, David L.; Nemeth, William; Grover, Sachit; Norman, Andrew; Yuan, Hao-Chih; Lee, Benjamin G.; LaSalvia, Vincenzo; Stradins, Paul

    2014-01-01

    We describe the design, fabrication and results of passivated contacts to n-type silicon utilizing thin SiO2 and transparent conducting oxide layers. High temperature silicon dioxide is grown on both surfaces of an n-type wafer to a thickness <50 Å, followed by deposition of tin-doped indium oxide (ITO) and a patterned metal contacting layer. As deposited, the thin-film stack has a very high J0,contact, and a non-ohmic, high contact resistance. However, after a forming gas anneal, the passivation quality and the contact resistivity improve significantly. The contacts are characterized by measuring the recombination parameter of the contact (J0,contact) and the specificmore » contact resistivity (ρcontact) using a TLM pattern. The best ITO/SiO2 passivated contact in this study has J0,contact = 92.5 fA/cm2 and ρcontact = 11.5 mOhm-cm2. These values are placed in context with other passivating contacts using an analysis that determines the ultimate efficiency and the optimal area fraction for contacts for a given set of (J0,contact, ρcontact) values. The ITO/SiO2 contacts are found to have a higher J0,contact, but a similar ρcontact compared to the best reported passivated contacts.« less

  15. Silicon carbide: A unique platform for metal-oxide-semiconductor physics

    NASA Astrophysics Data System (ADS)

    Liu, Gang; Tuttle, Blair R.; Dhar, Sarit

    2015-06-01

    A sustainable energy future requires power electronics that can enable significantly higher efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide (4H-SiC) is one of the most technologically advanced wide bandgap semiconductor that can outperform conventional silicon in terms of power handling, maximum operating temperature, and power conversion efficiency in power modules. While SiC Schottky diode is a mature technology, SiC power Metal Oxide Semiconductor Field Effect Transistors are relatively novel and there is large room for performance improvement. Specifically, major initiatives are under way to improve the inversion channel mobility and gate oxide stability in order to further reduce the on-resistance and enhance the gate reliability. Both problems relate to the defects near the SiO2/SiC interface, which have been the focus of intensive studies for more than a decade. Here we review research on the SiC MOS physics and technology, including its brief history, the state-of-art, and the latest progress in this field. We focus on the two main scientific problems, namely, low channel mobility and bias temperature instability. The possible mechanisms behind these issues are discussed at the device physics level as well as the atomic scale, with the support of published physical analysis and theoretical studies results. Some of the most exciting recent progress in interface engineering for improving the channel mobility and fundamental understanding of channel transport is reviewed.

  16. Study of the redox properties of bismuth-molybdate and uranium-antimonate catalysts

    SciTech Connect

    Paz-Pujalt, G.R.

    1985-01-01

    The oxidation/reduction properties of various bismuth molybdates, molybdenum trioxide, bismuth oxide, uranium antimonate, and iron antimonate have been studied in an effort to correlate them to their catalytic properties. The temperature at which ..gamma..-phase bismuth molybdate is prereduced plays an important role in the behavior the catalyst exhibits under reoxidation conditions. The overall behavior of ..gamma..-phase bismuth molybdate under catalytic conditions may be divided into two temperature regimes: below 360/sup 0/C the catalyst shows a higher rate of propylene adsorption than product desorption, and above 360/sup 0/C where produced desorption is dominant. This temperature is the same at which the Arrhenius plot for the reaction has a break. Several reduction of ..gamma..-bismuth molybdate results in the formation of clusters of bismuth metal and crystallites of molybdenum dioxide. This is irreversible. The reoxidation of the bismuth molybdate catalysts shows the presence of two oxygen incorporation temperatures. The ratios of the areas under these peaks are not the same for the three catalysts. Uranium antimonate shows a lesser degree of lattice oxygen participation. During several reduction the catalyst decomposes partially and an excess of antimony is evident. The isothermal reduction profiles of the catalysts permitted their classification into either of two reduction models: (A) ..cap alpha..-, ..beta..-, ..gamma..-phase bismuth molybdates, molybdenum trioxide, bismuth oxide, and the equimolar mixture follow the nucleation model, (B) uranium antimonate, and iron antimonate following the shrinking sphere model. These models have been correlated to certain characteristics of these catalysts. Group A catalysts show a high degree of lattice oxygen participation (migration of bulk oxygen to surface nuclei). In contrast in group B catalysts only a few layers of oxygen are peeled off during catalysis.

  17. Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon

    SciTech Connect

    Kamineni, Himani S.; Kamineni, Vimal K.; Moore, Richard L.; Gallis, Spyros; Diebold, Alain C.; Huang Mengbing; Kaloyeros, Alain E.

    2012-01-01

    Thermal oxidation effects on the structural, compositional, and optical properties of erbium films deposited on silicon via electron beam evaporation were analyzed by x-ray diffraction, x-ray photoelectron spectroscopy, Auger electron spectroscopy, and spectroscopic ellipsometry. A gradual rise in oxidation temperature from 700 to 900 deg. C resulted in a transition from ErO- to Er{sub 2}O{sub 3}-rich phase. Additional increase in oxidation temperature above 1000 deg. C led to the formation of erbium silicate due to further oxygen incorporation, as well as silicon out-diffusion from the substrate. A silicon oxide interfacial layer was also detected, with its thickness increasing with higher oxidation temperature. Additionally, film refractive index decreased, while its Tauc bandgap value increased from {approx}5.2 eV to {approx}6.4 eV, as the oxidation temperature was raised from 700 deg. C to above 900 deg. C. These transformations were accompanied by the appearance of an intense and broad absorption band below the optical gap. Thermal oxidation effects are discussed in the context of film structural characteristics and defect states.

  18. Behavior of incorporated nitrogen in plasma-nitrided silicon oxide formed by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Shinoda, Nao; Itokawa, Hiroshi; Fujitsuka, Ryota; Sekine, Katsuyuki; Onoue, Seiji; Tonotani, Junichi

    2016-04-01

    The behavior of nitrogen (N) atoms in plasma-nitrided silicon oxide (SiO2) formed by chemical vapor deposition (CVD) was characterized by physical analysis and from electrical properties. The changes in the chemical bonding and distribution of N in plasma-nitrided SiO2 were investigated for different subsequent processes. N-Si3, N-Si2O, and N2 are formed in a SiO2 film by plasma nitridation. N2 molecules diffuse out during annealing at temperatures higher than 900 °C. NH species are generated from N2 molecules and H in the SiO2 film with subsequent oxide deposition using O3 as an oxidant. The capacitance-voltage (C-V) curves of metal-oxide-semiconductor (MOS) capacitors are obtained. The negative shift of the C-V curve is caused by the increase in the density of positive fix charge traps in CVD-SiO2 induced by plasma nitridation. The C-V curve of plasma-nitrided SiO2 subjected to annealing shifts to the positive direction and that subjected to the subsequent oxide deposition shifts markedly to the negative direction. It is clarified that the density of positive charge fixed traps in plasma-nitrided SiO2 films decrease because the amount of N2 molecules is decreased by annealing, and that the density of traps increases because NH species are generated and move to the interface between SiO2 and the Si substrate with the subsequent oxide deposition.

  19. Design, microstructure, and high-temperature behavior of silicon nitride sintered with rate-earth oxides

    SciTech Connect

    Ciniculk, M.K. . Dept. of Materials Science and Mineral Engineering)

    1991-08-01

    The processing-microstructure-property relations of silicon nitride ceramics sintered with rare-earth oxide additives have been investigated with the aim of improving their high-temperature behavior. The additions of the oxides of Y, Sm, Gd, Dy, Er, or Yb were compositionally controlled to tailor the intergranular phase. The resulting microstructure consisted of {beta}-Si{sub 3}N{sub 4} grains and a crystalline secondary phase of RE{sub 2}Si{sub 2}O{sub 7}, with a thin residual amorphous phase present at grain boundaries. The lanthanide oxides were found to be as effective as Y{sub 2}O{sub 3} in densifying Si{sub 3}N{sub 4}, resulting in identical microstructures. The crystallization behavior of all six disilicates was similar, characterized by a limited nucleation and rapid growth mechanism resulting in large single crystals. Complete crystallization of the intergranular phase was obtained with the exception of a residual amorphous, observed at interfaces and believed to be rich in impurities, the cause of incomplete devitrification. The low resistance to oxidation of these materials was attributed to the minimization of amorphous phases via devitrification to disilicates, compatible with SiO{sub 2}, the oxidation product of Si{sub 3}N{sub 4}. The strength retention of these materials at 1300{degrees}C was found to be between 80% and 91% of room-temperature strength, due to crystallization of the secondary phase and a residual but refractory amorphous grain-boundary phase. The creep behavior was found to be strongly dependent on residual amorphous phase viscosity as well as on the oxidation behavior, as evidenced by the nonsteady-state creep rates of all materials. 122 refs., 51 figs., 12 tabs.

  20. Facile synthesis of binder-free reduced graphene oxide/silicon anode for high-performance lithium ion batteries

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Zuo, Pengjian; Chen, Cheng; Ma, Yulin; Cheng, Xinqun; Du, Chunyu; Gao, Yunzhi; Yin, Geping

    2016-04-01

    A novel binder-free reduced graphene oxide/silicon (RGO/Si) composite anode has been fabricated by a facile doctor-blade coating method. The relatively low C/O ratio plays an important role for the fabrication of the bind-free multilayered RGO/Si electrode with silicon nanoparticles encapsulating among the RGO sheet layers. The RGO provides the electron transport pathway and prevents the electrode fracture caused by the volume changes of active silicon particles during cycling. The RGO/Si composite anode with a silicon content of 66.7% delivers a reversible capacity of 1931 mAh g-1 at 0.2 A g-1 and still remains 92% of the initial capacity after 50 cycles.

  1. Improved gate oxide integrity of strained Si n-channel metal oxide silicon field effect transistors using thin virtual substrates

    NASA Astrophysics Data System (ADS)

    Yan, L.; Olsen, S. H.; Escobedo-Cousin, E.; O'Neill, A. G.

    2008-05-01

    This work presents a detailed study of ultrathin gate oxide integrity in strained Si metal oxide silicon field effect transistors (MOSFETs) fabricated on thin virtual substrates aimed at reducing device self-heating. The gate oxide quality and reliability of the devices are compared to those of simultaneously processed Si control devices and conventional thick virtual substrate devices that have the same Ge content (20%), strained Si channel thickness, and channel strain. The thin virtual substrates offer the same mobility enhancement as the thick virtual substrates (˜100% compared to universal mobility data) and are effective at reducing device self-heating. Up to 90% improvement in gate leakage current is demonstrated for the strained Si n-channel MOSFETs compared to that for the bulk Si controls. The lower leakage arises from the increased electron affinity in tensile strained Si and is significant due to the sizeable strain generated by using wafer-level stressors. The strain-induced leakage reductions also lead to major improvements in stress-induced leakage current (SILC) and oxide reliability. The lower leakage current of the thin and thick virtual substrate devices compares well to theoretical estimates based on the Wentzel-Kramers-Brillouin approximation. Breakdown characteristics also differ considerably between the devices, with the strained Si devices exhibiting a one order of magnitude increase in time to hard breakdown (THBD) compared to the Si control devices following high-field stressing at 17 MV cm-1. The strained Si devices are exempted from soft breakdown. Experimental based analytical leakage modeling has been carried out across the field range for the first time in thin oxides and demonstrates that Poole-Frenkel (PF) emissions followed by Fowler-Nordheim tunneling dominate gate leakage current at low fields in all of the devices. This contrasts to the frequently reported assumption that direct tunneling dominates gate leakage in ultrathin

  2. Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor

    SciTech Connect

    Hänninen, Tuomas Schmidt, Susann; Jensen, Jens; Hultman, Lars; Högberg, Hans

    2015-09-15

    Silicon oxynitride thin films were synthesized by reactive high power impulse magnetron sputtering of silicon in argon/nitrous oxide plasmas. Nitrous oxide was employed as a single-source precursor supplying oxygen and nitrogen for the film growth. The films were characterized by elastic recoil detection analysis, x-ray photoelectron spectroscopy, x-ray diffraction, x-ray reflectivity, scanning electron microscopy, and spectroscopic ellipsometry. Results show that the films are silicon rich, amorphous, and exhibit a random chemical bonding structure. The optical properties with the refractive index and the extinction coefficient correlate with the film elemental composition, showing decreasing values with increasing film oxygen and nitrogen content. The total percentage of oxygen and nitrogen in the films is controlled by adjusting the gas flow ratio in the deposition processes. Furthermore, it is shown that the film oxygen-to-nitrogen ratio can be tailored by the high power impulse magnetron sputtering-specific parameters pulse frequency and energy per pulse.

  3. Corrosion by liquid lead and lead-bismuth: experimental results review and analysis

    SciTech Connect

    Zhang, Jinsuo

    2008-01-01

    Liquid metal technologies for liquid lead and lead-bismuth alloy are under wide investigation and development for advanced nuclear energy systems and waste transmutation systems. Material corrosion is one of the main issues studied a lot recently in the development of the liquid metal technology. This study reviews corrosion by liquid lead and lead bismuth, including the corrosion mechanisms, corrosion inhibitor and the formation of the protective oxide layer. The available experimental data are analyzed by using a corrosion model in which the oxidation and scale removal are coupled. Based on the model, long-term behaviors of steels in liquid lead and lead-bismuth are predictable. This report provides information for the selection of structural materials for typical nuclear reactor coolant systems when selecting liquid lead or lead bismuth as heat transfer media.

  4. Tunnel oxide passivated contacts formed by ion implantation for applications in silicon solar cells

    NASA Astrophysics Data System (ADS)

    Reichel, Christian; Feldmann, Frank; Müller, Ralph; Reedy, Robert C.; Lee, Benjamin G.; Young, David L.; Stradins, Paul; Hermle, Martin; Glunz, Stefan W.

    2015-11-01

    Passivated contacts (poly-Si/SiOx/c-Si) doped by shallow ion implantation are an appealing technology for high efficiency silicon solar cells, especially for interdigitated back contact (IBC) solar cells where a masked ion implantation facilitates their fabrication. This paper presents a study on tunnel oxide passivated contacts formed by low-energy ion implantation into amorphous silicon (a-Si) layers and examines the influence of the ion species (P, B, or BF2), the ion implantation dose (5 × 1014 cm-2 to 1 × 1016 cm-2), and the subsequent high-temperature anneal (800 °C or 900 °C) on the passivation quality and junction characteristics using double-sided contacted silicon solar cells. Excellent passivation quality is achieved for n-type passivated contacts by P implantations into either intrinsic (undoped) or in-situ B-doped a-Si layers with implied open-circuit voltages (iVoc) of 725 and 720 mV, respectively. For p-type passivated contacts, BF2 implantations into intrinsic a-Si yield well passivated contacts and allow for iVoc of 690 mV, whereas implanted B gives poor passivation with iVoc of only 640 mV. While solar cells featuring in-situ B-doped selective hole contacts and selective electron contacts with P implanted into intrinsic a-Si layers achieved Voc of 690 mV and fill factor (FF) of 79.1%, selective hole contacts realized by BF2 implantation into intrinsic a-Si suffer from drastically reduced FF which is caused by a non-Ohmic Schottky contact. Finally, implanting P into in-situ B-doped a-Si layers for the purpose of overcompensation (counterdoping) allowed for solar cells with Voc of 680 mV and FF of 80.4%, providing a simplified and promising fabrication process for IBC solar cells featuring passivated contacts.

  5. Characterization of Interface State in Silicon Carbide Metal Oxide Semiconductor Capacitors

    NASA Astrophysics Data System (ADS)

    Kao, Wei-Chieh

    Silicon carbide (SiC) has always been considered as an excellent material for high temperature and high power devices. Since SiC is the only compound semiconductor whose native oxide is silicon dioxide (SiO2), it puts SiC in a unique position. Although SiC metal oxide semiconductor (MOS) technology has made significant progress in recent years, there are still a number of issues to be overcome before more commercial SiC devices can enter the market. The prevailing issues surrounding SiC MOSFET devices are the low channel mobility, the low quality of the oxide layer and the high interface state density at the SiC/SiO2 interface. Consequently, there is a need for research to be performed in order to have a better understanding of the factors causing the poor SiC/SiO2 interface properties. In this work, we investigated the generation lifetime in SiC materials by using the pulsed metal oxide semiconductor (MOS) capacitor method and measured the interface state density distribution at the SiC/SiO2 interface by using the conductance measurement and the high-low frequency capacitance technique. These measurement techniques have been performed on n-type and p-type SiC MOS capacitors. In the course of our investigation, we observed fast interface states at semiconductor-dielectric interfaces in SiC MOS capacitors that underwent three different interface passivation processes, such states were detected in the nitrided samples but not observed in PSG-passivated samples. This result indicate that the lack of fast states at PSG-passivated interface is one of the main reasons for higher channel mobility in PSG MOSFETs. In addition, the effect of mobile ions in the oxide on the response time of interface states has been investigated. In the last chapter we propose additional methods of investigation that can help elucidate the origin of the particular interface states, enabling a more complete understanding of the SiC/SiO2 material system.

  6. High performance of graphene oxide-doped silicon oxide-based resistance random access memory

    PubMed Central

    2013-01-01

    In this letter, a double active layer (Zr:SiO x /C:SiO x ) resistive switching memory device with outstanding performance is presented. Through current fitting, hopping conduction mechanism is found in both high-resistance state (HRS) and low-resistance state (LRS) of double active layer RRAM devices. By analyzing Raman and FTIR spectra, we observed that graphene oxide exists in C:SiO x layer. Compared with single Zr:SiO x layer structure, Zr:SiO x /C:SiO x structure has superior performance, including low operating current, improved uniformity in both set and reset processes, and satisfactory endurance characteristics, all of which are attributed to the double-layer structure and the existence of graphene oxide flakes formed by the sputter process. PMID:24261454

  7. Mineral resource of the month: bismuth

    USGS Publications Warehouse

    Carlin, James F.

    2006-01-01

    Bismuth compounds are most known for their soothing effects on the stomach, wounds and sores. These properties make the compounds an essential part of many medicinal and cosmetic preparations, which until 1930 accounted for about 90 percent of the bismuth used. The subsequent development of low-melting alloys and chemical catalysts containing bismuth, as well as its use as an additive to casting alloys, has resulted in a wider variety of industrial applications for bismuth.

  8. High-Temperature (1200-1400°C) Dry Oxidation of 3C-SiC on Silicon

    NASA Astrophysics Data System (ADS)

    Sharma, Y. K.; Li, F.; Jennings, M. R.; Fisher, C. A.; Pérez-Tomás, A.; Thomas, S.; Hamilton, D. P.; Russell, S. A. O.; Mawby, P. A.

    2015-11-01

    In a novel approach, high temperatures (1200-1400°C) were used to oxidize cubic silicon carbide (3C-SiC) grown on silicon substrate. High-temperature oxidation does not significantly affect 3C-SiC doping concentration, 3C-SiC structural composition, or the final morphology of the SiO2 layer, which remains unaffected even at 1400°C (the melting point of silicon is 1414°C). Metal-oxide-semiconductor capacitors (MOS-C) and lateral channel metal-oxide-semiconductor field-effect-transistors (MOSFET) were fabricated by use of the high-temperature oxidation process to study 3C-SiC/SiO2 interfaces. Unlike 4H-SiC MOSFET, there is no extra benefit of increasing the oxidation temperature from 1200°C to 1400°C. All the MOSFET resulted in a maximum field-effect mobility of approximately 70 cm2/V s.

  9. Ion microprobe study of the scale formed during high temperature oxidation of high silicon EN-1.4301 stainless steel

    NASA Astrophysics Data System (ADS)

    Paúl, A.; Elmrabet, S.; Alves, L. C.; da Silva, M. F.; Soares, J. C.; Odriozola, J. A.

    2001-07-01

    A study of the oxide layer formed on the surface of high silicon (0.8%) EN-1.4301 (AISI-304) stainless steel after 125 h oxidation in air at 1273 K has been performed by means of scanning electron microscopy (SEM), X-ray diffraction (XRD), RBS and proton microprobe. Oxidation experiments in synthetic air were performed in a thermobalance and the kinetic curve is compared to that of a standard EN-1.4301 austenitic stainless steel. These results show that the high silicon steel presents an enhanced oxidation resistance. XRD experiments show that the only crystalline species present in the scale is Cr 2O 3. Nevertheless, transversal section studies of the scale using proton microprobe show the development of a multilayered scale formed by an amorphous silicon rich layer in the scale to alloy interface and a Cr 2O 3 oxide layer in the external scale. Those results are confirmed by SEM experiments. The formation of the silica layer can be the responsible of the increase in the resistance to high temperature oxidation in this steel.

  10. Polycrystalline silicon ring resonator photodiodes in a bulk complementary metal-oxide-semiconductor process.

    PubMed

    Mehta, Karan K; Orcutt, Jason S; Shainline, Jeffrey M; Tehar-Zahav, Ofer; Sternberg, Zvi; Meade, Roy; Popović, Miloš A; Ram, Rajeev J

    2014-02-15

    We present measurements on resonant photodetectors utilizing sub-bandgap absorption in polycrystalline silicon ring resonators, in which light is localized in the intrinsic region of a p+/p/i/n/n+ diode. The devices, operating both at λ=1280 and λ=1550  nm and fabricated in a complementary metal-oxide-semiconductor (CMOS) dynamic random-access memory emulation process, exhibit detection quantum efficiencies around 20% and few-gigahertz response bandwidths. We observe this performance at low reverse biases in the range of a few volts and in devices with dark currents below 50 pA at 10 V. These results demonstrate that such photodetector behavior, previously reported by Preston et al. [Opt. Lett. 36, 52 (2011)], is achievable in bulk CMOS processes, with significant improvements with respect to the previous work in quantum efficiency, dark current, linearity, bandwidth, and operating bias due to additional midlevel doping implants and different material deposition. The present work thus offers a robust realization of a fully CMOS-fabricated all-silicon photodetector functional across a wide wavelength range. PMID:24562278

  11. Preparation and characterization of n-type microcrystalline hydrogenated silicon oxide films

    NASA Astrophysics Data System (ADS)

    Sarker, Arindam; Banerjee, Chandan; Barua, A. K.

    2002-06-01

    We have developed n-type microcrystalline hydrogenated silicon oxide (n-µc-SiO : H) thin films by the radio frequency plasma enhanced chemical vapour deposition (RF-PECVD, 13.56 MHz) method having suitable characteristics for use in the fabrication of single or multijunction amorphous silicon (a-Si) solar cells. The films have been characterized in detail for the study of structural and optoelectronic properties. Transmission electron microscopy, Raman spectroscopy, x-ray diffraction, Fourier transform infrared spectroscopy and x-ray photoelectron spectroscopy have been used for the structural studies. The dependence of the structure and optoelectronic properties of n-µc-SiO : H films on the various deposition parameters such as hydrogen dilution, chamber pressure, RF-power density etc have also been studied. Comparison of the properties between n-µc-SiO : H and n-µc-Si : H films have been studied, too, which shows that the former has higher optical gap (2.17 eV) and lower activation energy (0.015 eV) with similar electrical conductivity (12.08 S cm-1).

  12. Field emission from zinc oxide nanorod bundles grown on silicon nanoporous pillar array

    NASA Astrophysics Data System (ADS)

    Wang, Ling Li; Gong, Shang Dong; Wu, Li Hong; Li, Xin Jian

    2013-04-01

    A large-area zinc oxide (ZnO) nanorod bundle array was grown on a silicon nanoporous pillar array (Si-NPA) substrate by a chemical vapor deposition method, and its field-emission properties was studied. The structural characterization disclosed that the bundles were composed of hexagonal ZnO nanorods growing along c-axis and taking roots into the silicon pillars of Si-NPA. The average diameter and length of the ZnO nanorods were ∼145 nm and ∼10 μm, respectively. The field-emission measurements showed that the turn-on field of ZnO/Si-NPA was 4.6 V/μm with an emission current density (ECD) of 1 μA/cm2, and an ECD of 420 μA/cm2 was achieved at an applied field of 8.89 V/μm. The field enhancement factor was calculated to be ∼1700 based on the Fowler-Nordheim theory. According to the obtained charge coupled device (CCD) image, the density and brightness of the emission dots increased with the applied field, and the high emission dot density was attributed to the formation of a large number of ZnO nanorod emitting tips. Our results indicated that ZnO/Si-NPA might be a promising electron emission source.

  13. Damp and dry heat degradation of thermal oxide passivation of p+ silicon

    NASA Astrophysics Data System (ADS)

    Thomson, Andrew; Gardner, Matthew; McIntosh, Keith; Shalav, Avi; Bullock, James

    2014-03-01

    Thermal SiO2 passivates both moderately and heavily doped silicon surfaces irrespective of the dopant type, which is advantageous in high-efficiency solar cell designs. Commercial photovoltaic cells are submitted to accelerated ageing tests, such as damp-heat exposure, to ensure they maintain their performance for at least 20 yr. We find damp-heat exposure causes a severe and rapid degradation of thermal SiO2 passivation on p+ silicon surfaces. The reaction is so severe that the diffused-region recombination in the degraded state is limited by the diffusion of minority carriers to the Si-SiO2 interface not the density of interface defects Dit. Certainly, this effect renders the thermal-oxide passivation useless if employed on a solar cell. To study the cause of the degradation, we also test the effects of storage in dry heat and room ambient conditions. Examination of the rate of degradation in the tested storage conditions in comparison with modelled diffusion of moisture in SiO2, we find a significant correlation between the time dependent J0e and moisture supplied to the interface, leading us to the conclusion that moisture ingression and subsequent reaction at the SiO2-Si interface are the cause of both damp-heat and room- ambient degradation.

  14. Density profile in thin films of polybutadiene on silicon oxide substrates: a TOF-NR study.

    PubMed

    Hoppe, E Tilo; Sepe, Alessandro; Haese-Seiller, Martin; Moulin, Jean-François; Papadakis, Christine M

    2013-08-27

    We have investigated thin films from fully deuterated polybutadiene (PB-d6) on silicon substrates with the aim of detecting and characterizing a possible interphase in the polymer film near the substrate using time-of-flight neutron reflectometry (TOF-NR). As substrates, thermally oxidized silicon wafers were either used as such or they were coated with triethylethoxysilyl modified 1,2-PB prior to deposition of the PB-d6 film. TOF-NR reveals that, for both substrates, the scattering length density (SLD) of the PB films decreases near the solid interface. The reduction of SLD is converted to an excess fraction of free volume. To further verify the existence of the interphase in PB-d6, we attempt to model the TOF-NR curves with density profiles which do not feature an interphase. These density profiles do not describe the TOF-NR curves adequately. We conclude that, near the solid interface, an interphase having an SLD lower than the bulk of the film is present. PMID:23941468

  15. Electronic passivation of silicon surfaces by thin films of atomic layer deposited gallium oxide

    SciTech Connect

    Allen, T. G. Cuevas, A.

    2014-07-21

    This paper proposes the application of gallium oxide (Ga{sub 2}O{sub 3}) thin films to crystalline silicon solar cells. Effective passivation of n- and p-type crystalline silicon surfaces has been achieved by the application of very thin Ga{sub 2}O{sub 3} films prepared by atomic layer deposition using trimethylgallium (TMGa) and ozone (O{sub 3}) as the reactants. Surface recombination velocities as low as 6.1 cm/s have been recorded with films less than 4.5 nm thick. A range of deposition parameters has been explored, with growth rates of approximately 0.2 Å/cycle providing optimum passivation. The thermal activation energy for passivation of the Si-Ga{sub 2}O{sub 3} interface has been found to be approximately 0.5 eV. Depassivation of the interface was observed for prolonged annealing at increased temperatures. The activation energy for depassivation was measured to be 1.9 eV.

  16. Hot-pressed silicon nitride with various lanthanide oxides as sintering additives

    NASA Technical Reports Server (NTRS)

    Ueno, K.; Toibana, Y.

    1984-01-01

    The effects of addition of various lanthanide oxides and their mixture with Y2O3 on the sintering of Si3N4 were investigated. The addition of simple and mixed lanthanide oxides promoted the densification of Si3N4 in hot-pressing at 1800 C under 300-400kg/ centimeters squared for 60 min. The crystallization of yttrium and lanthanide-silicon oxynitrides which was observed inn the sintered body containing yttrium-lanthanide mixed oxides as additives led to the formation of a highly refractory Si3N4 ceramic having a bending strength of 82 and 84 kg/millimeters squared at room temperature and 1300 C respectively. In a Y2O3+La2O3 system, a higher molar ratio of La2O3 to Y2O3 gave a higher hardness and strength at high temperatures. It was found that 90 min was an optimum sintering time for the highest strength.

  17. Comprehensive Analysis of an Isolation Area Obtained by Local Oxidation of Silicon Without Field Implant

    NASA Astrophysics Data System (ADS)

    Fay, Jean-Luc; Beluch, Jean; Allirand, Laurence; Brosset, Dominique; Despax, Bernard; Bafleur, Marise; Sarrabayrouse, Gerard

    1999-09-01

    Isolation area, obtained by local oxidation of silicon (LOCOS) without field implant, naturally shows a high sensitivity of the leakage current to fixed charges in metal oxide semiconductor (MOS) parasitic transistors. It has been shown that during the deposition of the nitride capacitor insulator-layer, fixed charges are generated in the underlying plasma-deposited oxides. The behavior of the P-channel MOS (PMOS) parasitic transistor can be well accounted for by considering fixed charge creation in the thick part of the gate insulator. In the case of the N-channel MOS (NMOS) transistor, the leakage current is controlled by the bird's beak region where a high interface state density exists. The NMOS behavior has been explained taking into account the charge creation as well as a decrease in interface state density during nitride deposition. A new “recipe” for the nitride deposition based on a very low thermal budget has been established. Finally, a high threshold voltage and a reasonably low leakage current have been achieved for both the NMOS and PMOS parasitic transistors.

  18. Silicon rib waveguide electro-absorption optical modulator using transparent conductive oxide bilayer

    NASA Astrophysics Data System (ADS)

    Ayata, Masafumi; Nakano, Yoshiaki; Tanemura, Takuo

    2016-04-01

    We propose a novel ultra compact electro-absorption optical modulator based on a silicon rib waveguide and numerically demonstrate its performance. The proposed design employs two types of transparent conductive oxide (TCO) layers with different carrier densities to achieve both high modulation efficiency and low optical insertion loss. The thin TCO layer with high carrier density enables efficient modulation through the metal-oxide-semiconductor structure. On the other hand, the upper TCO layer with low carrier density allows low-resistance electrical contact for the top electrode without large optical loss. Using an indium tin oxide bilayer with optimized carrier densities, we numerically demonstrate a 4.3 dB extinction ratio and a 2.6 dB optical insertion loss with 1 µm device length. We estimate that the modulator operates under a low driving voltage of 1.3 V, exhibiting an ultra low energy consumption of 22.5 fJ/bit and a broad RC modulation bandwidth of over 40 GHz.

  19. Silicon dioxide nanoparticles increase macrophage atherogenicity: Stimulation of cellular cytotoxicity, oxidative stress, and triglycerides accumulation.

    PubMed

    Petrick, Lauren; Rosenblat, Mira; Paland, Nicole; Aviram, Michael

    2016-06-01

    Nanoparticle research has focused on their toxicity in general, while increasing evidence points to additional specific adverse effects on atherosclerosis development. Arterial macrophage cholesterol and triglyceride (TG) accumulation and foam cell formation are the hallmark of early atherogenesis, leading to cardiovascular events. To investigate the in vitro atherogenic effects of silicon dioxide (SiO2 ), J774.1 cultured macrophages (murine cell line) were incubated with SiO2 nanoparticle (SP, d = 12 nm, 0-20 µg/mL), followed by cellular cytotoxicity, oxidative stress, TG and cholesterol metabolism analyses. A significant dose-dependent increase in oxidative stress (up to 164%), in cytotoxicity (up to 390% measured by lactate dehydrogenase (LDH) release), and in TG content (up to 63%) was observed in SiO2 exposed macrophages compared with control cells. A smaller increase in macrophage cholesterol mass (up to 22%) was noted. TG accumulation in macrophages was not due to a decrease in TG cell secretion or to an increased TG biosynthesis rate, but was the result of attenuated TG hydrolysis secondary to decreased lipase activity and both adipose triglyceride lipase (ATGL) and hormone-sensitive lipase (HSL) protein expression (by 42 and 25%, respectively). Overall, SPs showed pro-atherogenic effects on macrophages as observed by cytotoxicity, increased oxidative stress and TG accumulation. © 2014 Wiley Periodicals, Inc. Environ Toxicol 31: 713-723, 2016.

  20. 21 CFR 73.2110 - Bismuth citrate.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... ADDITIVES EXEMPT FROM CERTIFICATION Cosmetics § 73.2110 Bismuth citrate. (a) Identity. The color additive... restrictions. The color additive bismuth citrate may be safely used in cosmetics intended for coloring hair on the scalp, subject to the following restrictions: (1) The amount of bismuth citrate in the...

  1. 21 CFR 73.2110 - Bismuth citrate.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... ADDITIVES EXEMPT FROM CERTIFICATION Cosmetics § 73.2110 Bismuth citrate. (a) Identity. The color additive... restrictions. The color additive bismuth citrate may be safely used in cosmetics intended for coloring hair on the scalp, subject to the following restrictions: (1) The amount of bismuth citrate in the...

  2. 21 CFR 73.2110 - Bismuth citrate.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... ADDITIVES EXEMPT FROM CERTIFICATION Cosmetics § 73.2110 Bismuth citrate. (a) Identity. The color additive... restrictions. The color additive bismuth citrate may be safely used in cosmetics intended for coloring hair on the scalp, subject to the following restrictions: (1) The amount of bismuth citrate in the...

  3. 21 CFR 73.2110 - Bismuth citrate.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... ADDITIVES EXEMPT FROM CERTIFICATION Cosmetics § 73.2110 Bismuth citrate. (a) Identity. The color additive... restrictions. The color additive bismuth citrate may be safely used in cosmetics intended for coloring hair on the scalp, subject to the following restrictions: (1) The amount of bismuth citrate in the...

  4. 21 CFR 73.2110 - Bismuth citrate.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... ADDITIVES EXEMPT FROM CERTIFICATION Cosmetics § 73.2110 Bismuth citrate. (a) Identity. The color additive... restrictions. The color additive bismuth citrate may be safely used in cosmetics intended for coloring hair on the scalp, subject to the following restrictions: (1) The amount of bismuth citrate in the...

  5. Translocation of double-strand DNA through a silicon oxide nanopore.

    PubMed

    Storm, A J; Chen, J H; Zandbergen, H W; Dekker, C

    2005-05-01

    We report double-strand DNA translocation experiments using silicon oxide nanopores with a diameter of about 10 nm . By monitoring the conductance of a voltage-biased pore, we detect molecules with a length ranging from 6557 to 48 500 base pairs. We find that the molecules can pass the pore both in a straight linear fashion and in a folded state. Experiments on circular DNA further support this picture. We sort the molecular events according to their folding state and estimate the folding position. As a proof-of-principle experiment, we show that a nanopore can be used to distinguish the lengths of DNA fragments present in a mixture. These experiments pave the way for quantitative analytical techniques with solid-state nanopores.

  6. Quantum dot made in metal oxide silicon-nanowire field effect transistor working at room temperature.

    PubMed

    Lavieville, Romain; Triozon, François; Barraud, Sylvain; Corna, Andrea; Jehl, Xavier; Sanquer, Marc; Li, Jing; Abisset, Antoine; Duchemin, Ivan; Niquet, Yann-Michel

    2015-05-13

    We report the observation of an atomic like behavior from T = 4.2 K up to room temperature in n- and p-type Ω-gate silicon nanowire (NW) transistors. For that purpose, we modified the design of a NW transistor and introduced long spacers between the source/drain and the channel in order to separate the channel from the electrodes. The channel was made extremely small (3.4 nm in diameter with 10 nm gate length) with a thick gate oxide (7 nm) in order to enhance the Coulomb repulsion between carriers, which can be as large as 200 meV when surface roughness promotes charge confinement. Parasitic stochastic Coulomb blockade effect can be eliminated in our devices by choosing proper control voltages. Moreover, the quantum dot can be tuned so that the resonant current at T = 4.2 K exceeds that at room temperature.

  7. Integrated atomistic chemical imaging and reactive force field molecular dynamic simulations on silicon oxidation

    SciTech Connect

    Dumpala, Santoshrupa; Broderick, Scott R.; Rajan, Krishna; Khalilov, Umedjon; Neyts, Erik C.; Duin, Adri C. T. van; Provine, J; Howe, Roger T.

    2015-01-05

    In this paper, we quantitatively investigate with atom probe tomography, the effect of temperature on the interfacial transition layer suboxide species due to the thermal oxidation of silicon. The chemistry at the interface was measured with atomic scale resolution, and the changes in chemistry and intermixing at the interface were identified on a nanometer scale. We find an increase of suboxide (SiOx) concentration relative to SiO{sub 2} and increased oxygen ingress with elevated temperatures. Our experimental findings are in agreement with reactive force field molecular dynamics simulations. This work demonstrates the direct comparison between atom probe derived chemical profiles and atomistic-scale simulations for transitional interfacial layer of suboxides as a function of temperature.

  8. Acoustic Properties of Polyurethane Composition Reinforced with Carbon Nanotubes and Silicon Oxide Nano-powder

    NASA Astrophysics Data System (ADS)

    Orfali, Wasim A.

    This article demonstrates the acoustic properties of added small amount of carbon-nanotube and siliconoxide nano powder (S-type, P-Type) to the host material polyurethane composition. By adding CNT and/or nano-silica in the form of powder at different concentrations up to 2% within the PU composition to improve the sound absorption were investigated in the frequency range up to 1600 Hz. Sound transmission loss measurement of the samples were determined using large impedance tube. The tests showed that addition of 0.2 wt.% Silicon Oxide Nano-powder and 0.35 wt.% carbon nanotube to polyurethane composition improved sound transmissions loss (Sound Absorption) up to 80 dB than that of pure polyurethane foam sample.

  9. Field emission behavior of cuboid zinc oxide nanorods on zinc-filled porous silicon

    NASA Astrophysics Data System (ADS)

    Yu, Ke; Zhang, Yongsheng; Xu, Rongli; Jiang, Desheng; Luo, Laiqiang; Li, Qiong; Zhu, Ziqiang; Lu, Wei

    2005-01-01

    Single-crystalline zinc oxide (ZnO) nanorods with cuboid morphology have been prepared on the zinc-filled porous silicon substrate using a vapor phase transport method. Field-emission measurements showed that the turn-on field and threshold field of the cuboid ZnO nanorods film were about 3.2 and 8.2 V/μm respectively. From the emitter surface, a homogeneous emission image was observed with emission site density (ESD) of ˜10 4 cm -2. The better emission uniformity and the high ESD may be attributed to a large number of ZnO nanocrystallites as emitter on the surface of the nanorod end contributing to emission.

  10. Growth and optical properties of quadrangular zinc oxide nanorods on copper-filled porous silicon

    NASA Astrophysics Data System (ADS)

    Yu, K.; Zhang, Y.; Luo, L.; Wang, W.; Zhu, Z.; Wang, J.; Cui, Y.; Ma, H.; Lu, W.

    Zinc oxide (ZnO) nanorods with quadrangular morphology have been successfully prepared on a copper-filled porous silicon substrate using a vapor phase transport method. Scanning electron microscopy showed that the diameters of the nanorods were scattered in a range of 100-400 nm and the lengths up to 2 μm. High-resolution transmission electron microscopy and a selected-area electron-diffraction pattern confirmed that the quadrangular ZnO nanorods had a single-crystal wurtzite structure and grew along the (0001) direction. The photoluminescence spectrum under excitation at 325 nm showed an ultraviolet emission at 386 nm and a strong broad green emission at 518 nm at room temperature.

  11. Fabrication and characterization of copper oxide-silicon nanowire heterojunction photodiodes

    NASA Astrophysics Data System (ADS)

    Akgul, Guvenc; Aksoy Akgul, Funda; Mulazimoglu, Emre; Emrah Unalan, Husnu; Turan, Rasit

    2014-02-01

    In this study, copper oxide (CuO) thin film/silicon (Si) nanowire heterojunctions have been fabricated and their optoelectronic performances have been investigated. Vertically aligned n-type Si nanowires have been fabricated using metal-assisted etching (MAE) technique. CuO thin films were synthesized by the sol-gel method and deposited onto the nanowires through spin-coating. Fabricated nanowire heterojunction devices exhibited excellent diode behaviour compared to the planar heterojunction control device. The rectification ratios were found to be 105 and 101 for nanowire and planar heterojunctions, respectively. The improved electrical properties and photosensitivity of the nanowire heterojunction diode was observed, which was related to the three-dimensional nature of the interface between the Si nanowires and the CuO film. Results obtained in this work reveal the potential of Si nanowire-based heterojunctions for various optoelectronic devices.

  12. Nanocrystalline Zn2SiO4:Mn2+ grown in oxidized porous silicon

    NASA Astrophysics Data System (ADS)

    Taghavinia, N.; Lerondel, G.; Makino, H.; Yamamoto, A.; Yao, T.; Kawazoe, Y.; Goto, T.

    2001-12-01

    Zn2SiO4:Mn2+ nanocrystals were grown in an oxidized porous silicon layer using a chemical impregnation method. Apparently two classes of samples have been obtained. One is characterized by the formation of α-phase zinc silicate crystalline particles, which show green luminescence, and the other one is characterized by β-phase particles, showing yellow luminescence. It was found that in general prolonged annealing, as well as a high degree of impregnation leads to the formation of green-luminescent samples. The decay time of both yellow and green luminescence decreases with the concentration of Mn activator, while generally the decay time of yellow luminescence is considerably larger than that of green luminescence.

  13. Synthesis of magnetite-silica core-shell nanoparticles via direct silicon oxidation.

    PubMed

    Wang, Shuxian; Tang, Jing; Zhao, Hongfu; Wan, Jiaqi; Chen, Kezheng

    2014-10-15

    Magnetite-silica core-shell nanoparticles (Fe3O4@SiO2 NPs) were prepared from silicon powder by direct oxidation without using any expensive precursors (such as TEOS) and organic solvents. The as-prepared Fe3O4@SiO2 NPs were characterized by TEM, DLS, XRD, FT-IR, zeta potential and NMR Analyzer. The results show that the Fe3O4@SiO2 NPs are monodispersed core-shell nanostructures with single cores that were uniformly coated by silica shells. The relaxation property indicates that Fe3O4@SiO2 NPs have desirable characteristics for T2 MRI contrast agents. This facile and green method is promising for large-scale production, which would open new opportunities for preparing core-shell nanostructures for biomedical applications.

  14. Soft lithographic functionalization and patterning oxide-free silicon and germanium.

    PubMed

    Bowers, Carleen M; Toone, Eric J; Clark, Robert L; Shestopalov, Alexander A

    2011-12-16

    The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a stable interface that permits efficient electron transport and protects underlying substrates from oxidative degradation. Group IV semiconductors can be effectively protected with highly-ordered self-assembled monolayers (SAMs) composed of simple alkyl chains that act as impervious barriers to both organic and aqueous solutions. Simple alkyl SAMs, however, are inert and not amenable to traditional patterning techniques. The motivation for immobilizing organic molecular systems on semiconductors is to impart new functionality to the surface that can provide optical, electronic, and mechanical function, as well as chemical and biological activity. Microcontact printing (μCP) is a soft-lithographic technique for patterning SAMs on myriad surfaces. Despite its simplicity and versatility, the approach has been largely limited to noble metal surfaces and has not been well developed for pattern transfer to technologically important substrates such as oxide-free silicon and germanium. Furthermore, because this technique relies on the ink diffusion to transfer pattern from the elastomer to substrate, the resolution of such traditional printing is essentially limited to near 1 μm. In contrast to traditional printing, inkless μCP patterning relies on a specific reaction between a surface-immobilized substrate and a stamp-bound catalyst. Because the technique does not rely on diffusive SAM formation, it significantly expands the diversity of patternable surfaces. In addition, the inkless technique obviates the feature size limitations imposed by molecular diffusion, facilitating replication of very small (<200 nm) features. However, up till now, inkless μCP has been mainly used for patterning relatively disordered molecular systems, which do not protect underlying surfaces from degradation. Here, we report a simple, reliable

  15. Soft lithographic functionalization and patterning oxide-free silicon and germanium.

    PubMed

    Bowers, Carleen M; Toone, Eric J; Clark, Robert L; Shestopalov, Alexander A

    2011-01-01

    The development of hybrid electronic devices relies in large part on the integration of (bio)organic materials and inorganic semiconductors through a stable interface that permits efficient electron transport and protects underlying substrates from oxidative degradation. Group IV semiconductors can be effectively protected with highly-ordered self-assembled monolayers (SAMs) composed of simple alkyl chains that act as impervious barriers to both organic and aqueous solutions. Simple alkyl SAMs, however, are inert and not amenable to traditional patterning techniques. The motivation for immobilizing organic molecular systems on semiconductors is to impart new functionality to the surface that can provide optical, electronic, and mechanical function, as well as chemical and biological activity. Microcontact printing (μCP) is a soft-lithographic technique for patterning SAMs on myriad surfaces. Despite its simplicity and versatility, the approach has been largely limited to noble metal surfaces and has not been well developed for pattern transfer to technologically important substrates such as oxide-free silicon and germanium. Furthermore, because this technique relies on the ink diffusion to transfer pattern from the elastomer to substrate, the resolution of such traditional printing is essentially limited to near 1 μm. In contrast to traditional printing, inkless μCP patterning relies on a specific reaction between a surface-immobilized substrate and a stamp-bound catalyst. Because the technique does not rely on diffusive SAM formation, it significantly expands the diversity of patternable surfaces. In addition, the inkless technique obviates the feature size limitations imposed by molecular diffusion, facilitating replication of very small (<200 nm) features. However, up till now, inkless μCP has been mainly used for patterning relatively disordered molecular systems, which do not protect underlying surfaces from degradation. Here, we report a simple, reliable

  16. Paralinear Oxidation of Silicon Nitride in a Water Vapor/Oxygen Environment

    NASA Technical Reports Server (NTRS)

    Fox, Dennis S.; Opila, Elizabeth J.; Nguyen, QuynhGiao; Humphrey, Donald L.; Lewton, Susan M.; Gray, Hugh R. (Technical Monitor)

    2002-01-01

    Three silicon nitride materials were exposed to dry oxygen flowing at 0.44 cm/s at temperatures between 1200 and 1400 C. Reaction kinetics were measured with a continuously recording microbalance. Parabolic kinetics were observed. When the same materials were exposed to a 50% H2O - 50% O2 gas mixture flowing at 4.4 cm/s, all three types exhibited paralinear kinetics. The material is oxidized by water vapor to form solid silica. The protective silica is in turn volatilized by water vapor to form primarily gaseous Si(OH)4. Nonlinear least squares analysis and a paralinear kinetic model were used to determine both parabolic and linear rate constants from the kinetic data. Volatilization of the protective silica scale can result in accelerated consumption of Si3N4. Recession rates under conditions more representative of actual combustors are compared to the furnace data.

  17. The stability of tin silicon oxide thin-film transistors with different annealing temperatures

    NASA Astrophysics Data System (ADS)

    Yang, Jianwen; Fu, Ruofan; Han, Yanbing; Meng, Ting; Zhang, Qun

    2016-07-01

    The influence of annealing temperature on the electrical properties of tin silicon oxide (TSO) thin-film transistors (TFTs) and the corresponding bias stress stability have been investigated. With increasing annealing temperature, the TSO films present a structure which is closer to crystallization, and it is conducive to the improvement of the mobility of TSO TFTs. Meanwhile, the positive bias stress (PBS) stability of TSO TFTs is ameliorated due to the decreasing traps at the interface of dielectric layer and channel layer. The threshold voltage shifts in opposite direction after being stressed under negative bias stress (NBS), which is due to the competition between electrons captured by defects related to oxygen vacancies in the channel layer and water molecule adsorption on the back channel.

  18. Light-induced water oxidation at silicon electrodes functionalized with a cobalt oxygen-evolving catalyst.

    PubMed

    Pijpers, Joep J H; Winkler, Mark T; Surendranath, Yogesh; Buonassisi, Tonio; Nocera, Daniel G

    2011-06-21

    Integrating a silicon solar cell with a recently developed cobalt-based water-splitting catalyst (Co-Pi) yields a robust, monolithic, photo-assisted anode for the solar fuels process of water splitting to O(2) at neutral pH. Deposition of the Co-Pi catalyst on the Indium Tin Oxide (ITO)-passivated p-side of a np-Si junction enables the majority of the voltage generated by the solar cell to be utilized for driving the water-splitting reaction. Operation under neutral pH conditions fosters enhanced stability of the anode as compared to operation under alkaline conditions (pH 14) for which long-term stability is much more problematic. This demonstration of a simple, robust construct for photo-assisted water splitting is an important step towards the development of inexpensive direct solar-to-fuel energy conversion technologies.

  19. A CMOS compatible Microbulk Micromegas-like detector using silicon oxide as spacer material

    NASA Astrophysics Data System (ADS)

    Blanco Carballo, V. M.; Fransen, M.; van der Graaf, H.; Lu, J.; Schmitz, J.

    2011-02-01

    We present a new Micro Pattern Gaseous Detector (MPGD) fabricated with nonpolymeric materials. The device structure is similar to a Microbulk Micromegas design, consisting of a punctured metal grid supported by a continuous perforated insulating structure. In this detector, the supporting structure is made out of silicon oxide. Devices were tested in He/ iC 4H 10 (80/20) and Ar/ iC 4H 10 (80/20) gas mixtures under 55Fe irradiation. Gas gain of 20,000 and energy resolution below 13% FWHM were achieved. The CMOS compatibility of the fabrication process has been studied in Timepix chips as well as individual 0.13-μm technology CMOS transistors. Complete detectors have been fabricated on top of Timepix chips. In an Ar/ iC 4H 10 (80/20) gas mixture 55Fe decay events were recorded operating the Timepix chip in 2D readout mode.

  20. Low Temperature STM Study of Adsoption of Nitric Oxide on Silicon(111)-7x7

    NASA Astrophysics Data System (ADS)

    Rezaei, M. A.; Stipe, B. C.; Ho, W.

    1997-03-01

    We have constructed a variable temperature (30 K to 300 K) scanning tunneling microscope for use in ultra high vacuum. In contrast to studies at room temperature and above, thermally induced dissociation can be minimized at low temperatures. The adsorption of nitric oxide on silicon(111)-7x7 at 32 K revealed several species in different sites on the surface. When the surface is scanned at 2 volt sample bias and 1 nA of tunneling current, all but one species are stable. This metastable species is observed to desorb. At -2 volts sample bias and 1 nA, we can induce changes in the bonding of other species on the surface. The dependence of the observed changes on the polarity of the sample bias suggests the need to consider both the empty and filled states of adsorbed NO-surface complex.

  1. Light-induced water oxidation at silicon electrodes functionalized with a cobalt oxygen-evolving catalyst

    PubMed Central

    Pijpers, Joep J. H.; Winkler, Mark T.; Surendranath, Yogesh; Buonassisi, Tonio; Nocera, Daniel G.

    2011-01-01

    Integrating a silicon solar cell with a recently developed cobalt-based water-splitting catalyst (Co-Pi) yields a robust, monolithic, photo-assisted anode for the solar fuels process of water splitting to O2 at neutral pH. Deposition of the Co-Pi catalyst on the Indium Tin Oxide (ITO)-passivated p-side of a np-Si junction enables the majority of the voltage generated by the solar cell to be utilized for driving the water-splitting reaction. Operation under neutral pH conditions fosters enhanced stability of the anode as compared to operation under alkaline conditions (pH 14) for which long-term stability is much more problematic. This demonstration of a simple, robust construct for photo-assisted water splitting is an important step towards the development of inexpensive direct solar-to-fuel energy conversion technologies. PMID:21646536

  2. Characterization and simulation on antireflective coating of amorphous silicon oxide thin films with gradient refractive index

    NASA Astrophysics Data System (ADS)

    Huang, Lu; Jin, Qi; Qu, Xingling; Jin, Jing; Jiang, Chaochao; Yang, Weiguang; Wang, Linjun; Shi, Weimin

    2016-08-01

    The optical reflective properties of silicon oxide (SixOy) thin films with gradient refractive index are studied both theoretically and experimentally. The thin films are widely used in photovoltaic as antireflective coatings (ARCs). An effective finite difference time domain (FDTD) model is built to find the optimized reflection spectra corresponding to structure of SixOy ARCs with gradient refractive index. Based on the simulation analysis, it shows the variation of reflection spectra with gradient refractive index distribution. The gradient refractive index of SixOy ARCs can be obtained in adjustment of SiH4 to N2O ratio by plasma-enhanced chemical vapor deposition (PECVD) system. The optimized reflection spectra measured by UV-visible spectroscopy confirms to agree well with that simulated by FDTD method.

  3. Carrier Selective, Passivated Contacts for High Efficiency Silicon Solar Cells based on Transparent Conducting Oxides

    SciTech Connect

    Young, David L.; Nemeth, William; Grover, Sachit; Norman, Andrew; Yuan, Hao-Chih; Lee, Benjamin G.; LaSalvia, Vincenzo; Stradins, Paul

    2014-01-01

    We describe the design, fabrication and results of passivated contacts to n-type silicon utilizing thin SiO2 and transparent conducting oxide layers. High temperature silicon dioxide is grown on both surfaces of an n-type wafer to a thickness <50 Å, followed by deposition of tin-doped indium oxide (ITO) and a patterned metal contacting layer. As deposited, the thin-film stack has a very high J0,contact, and a non-ohmic, high contact resistance. However, after a forming gas anneal, the passivation quality and the contact resistivity improve significantly. The contacts are characterized by measuring the recombination parameter of the contact (J0,contact) and the specific contact resistivity (ρcontact) using a TLM pattern. The best ITO/SiO2 passivated contact in this study has J0,contact = 92.5 fA/cm2 and ρcontact = 11.5 mOhm-cm2. These values are placed in context with other passivating contacts using an analysis that determines the ultimate efficiency and the optimal area fraction for contacts for a given set of (J0,contact, ρcontact) values. The ITO/SiO2 contacts are found to have a higher J0,contact, but a similar ρcontact compared to the best reported passivated contacts.

  4. Nano sized bismuth oxy chloride by metal organic chemical vapour deposition

    NASA Astrophysics Data System (ADS)

    Jagdale, Pravin; Castellino, Micaela; Marrec, Françoise; Rodil, Sandra E.; Tagliaferro, Alberto

    2014-06-01

    Metal organic chemical vapour deposition (MOCVD) method was used to prepare thin films of bismuth based nano particles starting from bismuth salts. Nano sized bismuth oxy chloride (BiOCl) crystals were synthesized from solution containing bismuth chloride (BiCl3) in acetone (CH3sbnd COsbnd CH3). Self-assembly of nano sized BiOCl crystals were observed on the surface of silicon, fused silica, copper, carbon nanotubes and aluminium substrates. Various synthesis parameters and their significant impact onto the formation of self-assembled nano-crystalline BiOCl were investigated. BiOCl nano particles were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy and Micro-Raman spectroscopy. These analyses confirm that bismuth nanometer-sized crystal structures showing a single tetragonal phase were indeed bismuth oxy chloride (BiOCl) square platelets 18-250 nm thick and a few micrometres wide.

  5. Design, analysis, and characterization of stress-engineered 3D microstructures comprised of PECVD silicon oxide and nitride

    NASA Astrophysics Data System (ADS)

    Pi, Chia-Hsing; Turner, Kevin T.

    2016-06-01

    Microelectromechanical systems (MEMS) are typically 2D or quasi-3D structures fabricated using surface and bulk micromachining processes. In this work, an approach for 3D structure fabrication based on stress engineering is demonstrated. Specifically, sub-mm 3D spherical cage-like structures are realized through the deformation of bilayers of residually-stressed silicon oxide and silicon nitride with micrometer-scale thicknesses. Analytical and finite models to predict the shape of stress-engineered structures based on geometry and residual stress are described and used for structure design. A systematic experimental study was performed to quantify residual stresses in silicon nitride films made by plasma-enhanced chemical vapor deposition (PECVD). The measurements show that the residual stress of PECVD silicon nitride can be tuned over a wide range of tensile stresses through the control of deposition parameters, such as flow rate and power. Stress engineered 3D cage-like structures comprised of PECVD silicon nitride and oxide films were fabricated. 3D structures with a range of curvatures were demonstrated. The measured geometry of the fabricated structures are in good agreement with predictions from analytical and finite element models.

  6. Enhancement of light extraction in silicon-rich oxide light-emitting diodes by one-dimensional photonic crystal gratings

    NASA Astrophysics Data System (ADS)

    Llorens, J. M.; Postigo, P. A.; Juvert, J.; González, A.; Domínguez, C.

    2013-09-01

    In this work we show the design of one-dimensional nanophotonic structures (photonic crystal gratings) for enhancement of extraction of light with specific wavelengths in light-emitting diodes (LEDs). The LEDs are made of silicon-rich oxide embedding silicon nanolayers with emission in the visible spectrum. The LED structure consists of a poly-silicon top layer 310 nm thick, a silicon-rich oxide layer with nanoparticles and a silicon substrate. The gratings are formed by grooves separated with periods ranging from 200 nm to 600 nm and widths 0.72 times the period engraved on the top layer. We have performed two dimensional finite-difference time-domain simulations to obtain the values for the internal and external quantum efficiency (EQE) in the normal direction in a spectral window from 400 nm to 500 nm. The results show that it is possible to achieve a strong enhancement in the EQE in the short wavelength region (400 nm) while it reaches 5-fold enhancement at longer wavelengths.

  7. Valence band offset in heterojunctions between crystalline silicon and amorphous silicon (sub)oxides (a-SiO{sub x}:H, 0 < x < 2)

    SciTech Connect

    Liebhaber, M.; Mews, M.; Schulze, T. F.; Korte, L. Rech, B.; Lips, K.

    2015-01-19

    The heterojunction between amorphous silicon (sub)oxides (a-SiO{sub x}:H, 0 < x < 2) and crystalline silicon (c-Si) is investigated. We combine chemical vapor deposition with in-system photoelectron spectroscopy in order to determine the valence band offset ΔE{sub V} and the interface defect density, being technologically important junction parameters. ΔE{sub V} increases from ≈0.3 eV for the a-Si:H/c-Si interface to >4 eV for the a-SiO{sub 2}/c-Si interface, while the electronic quality of the heterointerface deteriorates. High-bandgap a-SiO{sub x}:H is therefore unsuitable for the hole contact in heterojunction solar cells, due to electronic transport hindrance resulting from the large ΔE{sub V}. Our method is readily applicable to other heterojunctions.

  8. Continuous-flow Mass Production of Silicon Nanowires via Substrate-Enhanced Metal-Catalyzed Electroless Etching of Silicon with Dissolved Oxygen as an Oxidant

    NASA Astrophysics Data System (ADS)

    Hu, Ya; Peng, Kui-Qing; Liu, Lin; Qiao, Zhen; Huang, Xing; Wu, Xiao-Ling; Meng, Xiang-Min; Lee, Shuit-Tong

    2014-01-01

    Silicon nanowires (SiNWs) are attracting growing interest due to their unique properties and promising applications in photovoltaic devices, thermoelectric devices, lithium-ion batteries, and biotechnology. Low-cost mass production of SiNWs is essential for SiNWs-based nanotechnology commercialization. However, economic, controlled large-scale production of SiNWs remains challenging and rarely attainable. Here, we demonstrate a facile strategy capable of low-cost, continuous-flow mass production of SiNWs on an industrial scale. The strategy relies on substrate-enhanced metal-catalyzed electroless etching (MCEE) of silicon using dissolved oxygen in aqueous hydrofluoric acid (HF) solution as an oxidant. The distinct advantages of this novel MCEE approach, such as simplicity, scalability and flexibility, make it an attractive alternative to conventional MCEE methods.

  9. Continuous-flow mass production of silicon nanowires via substrate-enhanced metal-catalyzed electroless etching of silicon with dissolved oxygen as an oxidant.

    PubMed

    Hu, Ya; Peng, Kui-Qing; Liu, Lin; Qiao, Zhen; Huang, Xing; Wu, Xiao-Ling; Meng, Xiang-Min; Lee, Shuit-Tong

    2014-01-13

    Silicon nanowires (SiNWs) are attracting growing interest due to their unique properties and promising applications in photovoltaic devices, thermoelectric devices, lithium-ion batteries, and biotechnology. Low-cost mass production of SiNWs is essential for SiNWs-based nanotechnology commercialization. However, economic, controlled large-scale production of SiNWs remains challenging and rarely attainable. Here, we demonstrate a facile strategy capable of low-cost, continuous-flow mass production of SiNWs on an industrial scale. The strategy relies on substrate-enhanced metal-catalyzed electroless etching (MCEE) of silicon using dissolved oxygen in aqueous hydrofluoric acid (HF) solution as an oxidant. The distinct advantages of this novel MCEE approach, such as simplicity, scalability and flexibility, make it an attractive alternative to conventional MCEE methods.

  10. A versatile sol-gel synthesis route to metal-silicon mixed oxide nanocomposites that contain metal oxides as the major phase

    SciTech Connect

    Clapsaddle, B J; Sprehn, D W; Gash, A E; Satcher, J H; Simpson, R L

    2003-12-08

    The general synthesis of metal-silicon mixed oxide nanocomposite materials, including a variety of both main group and transition metals, in which the metal oxide is the major component is described. In a typical synthesis, the metal oxide precursor, MCl{sub x}{times}{sub y}H{sub 2}O (x=3-6, y=0-7), was mixed with the silica precursor, tetramethylorthosilicate (TMOS), in ethanol and gelled using an organic epoxide. The successful preparation of homogeneous, monolithic materials depended on the oxidation state of the metal as well as the epoxide chosen for gelation. The composition of the resulting materials was varied from M/Si=1-5 (mol/mol) by adjusting the amount of TMOS added to the initial metal oxide precursor solution. Supercritical processing of the gels in CO{sub 2} resulted in monolithic, porous aerogel nanocomposite materials with surface areas ranging from 100 - 800 m{sup 2}/g. The bulk materials are composed of metal oxide/silica particles that vary in size from 5 - 20 nm depending on the epoxide used for gelation. Metal oxide and silica dispersion throughout the bulk material is extremely uniform on the nanoscale. The versatility and control of the synthesis method will be discussed as well as the properties of the resulting metal-silicon mixed oxide nanocomposite materials.

  11. Plasma surface oxidation of 316L stainless steel for improving adhesion strength of silicone rubber coating to metal substrate

    NASA Astrophysics Data System (ADS)

    Latifi, Afrooz; Imani, Mohammad; Khorasani, Mohammad Taghi; Daliri Joupari, Morteza

    2014-11-01

    Stainless steel 316L is one of the most widely used materials for fabricating of biomedical devices hence, improving its surface properties is still of great interest and challenging in biomaterial sciences. Plasma oxidation, in comparison to the conventional chemical or mechanical methods, is one of the most efficient methods recently used for surface treatment of biomaterials. Here, stainless steel specimens were surface oxidized by radio-frequency plasma irradiation operating at 34 MHz under pure oxygen atmosphere. Surface chemical composition of the samples was significantly changed after plasma oxidation by appearance of the chromium and iron oxides on the plasma-oxidized surface. A wettable surface, possessing high surface energy (83.19 mN m-1), was observed after plasma oxidation. Upon completion of the surface modification process, silicone rubber was spray coated on the plasma-treated stainless steel surface. Morphology of the silicone rubber coating was investigated by scanning electron microscopy (SEM). A uniform coating was formed on the oxidized surface with no delamination at polymer-metal interface. Pull-off tests showed the lowest adhesion strength of coating to substrate (0.12 MPa) for untreated specimens and the highest (0.89 MPa) for plasma-oxidized ones.

  12. Comparative cytotoxicity and genotoxicity of cobalt (II, III) oxide, iron (III) oxide, silicon dioxide, and aluminum oxide nanoparticles on human lymphocytes in vitro.

    PubMed

    Rajiv, S; Jerobin, J; Saranya, V; Nainawat, M; Sharma, A; Makwana, P; Gayathri, C; Bharath, L; Singh, M; Kumar, M; Mukherjee, A; Chandrasekaran, N

    2016-02-01

    Despite the extensive use of nanoparticles (NPs) in various fields, adequate knowledge of human health risk and potential toxicity is still lacking. The human lymphocytes play a major role in the immune system, and it can alter the antioxidant level when exposed to NPs. Identification of the hazardous NPs was done using in vitro toxicity tests and this study mainly focuses on the comparative in vitro cytotoxicity and genotoxicity of four different NPs including cobalt (II, III) oxide (Co3O4), iron (III) oxide (Fe2O3), silicon dioxide (SiO2), and aluminum oxide (Al2O3) on human lymphocytes. The Co3O4 NPs showed decrease in cellular viability and increase in cell membrane damage followed by Fe2O3, SiO2, and Al2O3 NPs in a dose-dependent manner after 24 h of exposure to human lymphocytes. The oxidative stress was evidenced in human lymphocytes by the induction of reactive oxygen species, lipid peroxidation, and depletion of catalase, reduced glutathione, and superoxide dismutase. The Al2O3 NPs showed the least DNA damage when compared with all the other NPs. Chromosomal aberration was observed at 100 µg/ml when exposed to Co3O4 NPs and Fe2O3 NPs. The alteration in the level of antioxidant caused DNA damage and chromosomal aberration in human lymphocytes.

  13. Efficient and stable photo-oxidation of water by a bismuth vanadate photoanode coupled with an iron oxyhydroxide oxygen evolution catalyst.

    PubMed

    Seabold, Jason A; Choi, Kyoung-Shin

    2012-02-01

    BiVO(4) films were prepared by a simple electrodeposition and annealing procedure and studied as oxygen evolving photoanodes for application in a water splitting photoelectrochemical cell. The resulting BiVO(4) electrodes maintained considerable photocurrent for photo-oxidation of sulfite, but generated significantly reduced photocurrent for photo-oxidation of water to oxygen, also decaying over time, suggesting that the photoelectrochemical performance of BiVO(4) for water oxidation is mainly limited by its poor catalytic ablity to oxidize water. In order to improve the water oxidation kinetics of the BiVO(4) electrode, a layer of FeOOH was placed on the BiVO(4) surface as an oxygen evolution catalyst using a new photodeposition route. The resulting BiVO(4)/FeOOH photoanode exhibitied significantly improved photocurrent and stability for photo-oxidation of water, which is one of the best among all oxide-based phoatoanode systems reported to date. In particular, the BiVO(4)/FeOOH photoanode showed an outstanding performance in the low bias region (i.e., E < 0.8 V vs RHE), which is critical in determining the overall operating current density when assembling a complete p-n photoelectrochemical diode cell. The photocurrent-to-O(2) conversion efficiency of the BiVO(4)/FeOOH photoanode is ca. 96%, confirming that the photogenerated holes in the BiVO(4)/FeOOH photoanode are indeed excusively used for O(2) evolution. PMID:22263661

  14. Third order nonlinear optical properties of bismuth zinc borate glasses

    SciTech Connect

    Shanmugavelu, B.; Ravi Kanth Kumar, V. V.; Kuladeep, R.; Narayana Rao, D.

    2013-12-28

    Third order nonlinear optical characterization of bismuth zinc borate glasses are reported here using different laser pulse durations. Bismuth zinc borate glasses with compositions xBi{sub 2}O{sub 3}-30ZnO-(70-x) B{sub 2}O{sub 3} (where x = 30, 35, 40, and 45 mol. %) have been prepared by melt quenching method. These glasses were characterized by Raman, UV-Vis absorption, and Z scan measurements. Raman and UV-Vis spectroscopic results indicate that non-bridging oxygens increase with increase of bismuth content in the glass. Nonlinear absorption and refraction behavior in the nanosecond (ns), picosecond (ps), and femtosecond (fs) time domains were studied in detail. Strong reverse saturable absorption due to dominant two-photon absorption (TPA) was observed with both ps and fs excitations. In the case of ns pulse excitations, TPA and free-carrier absorption processes contribute for the nonlinear absorption. Two-photon absorption coefficient (β) and the absorption cross section due to free carriers (σ{sub e}) are estimated by theoretical fit of the open aperture Z-scan measurements and found to be dependent on the amount of bismuth oxide in the glass composition. In both ns and fs regimes the sign and magnitude of the third order nonlinearity are evaluated, and the optical limiting characteristics are also reported.

  15. Controllably Interfacing with Ferroelectric Layer: A Strategy for Enhancing Water Oxidation on Silicon by Surface Polarization.

    PubMed

    Cui, Wei; Xia, Zhouhui; Wu, Shan; Chen, Fengjiao; Li, Yanguang; Sun, Baoquan

    2015-11-25

    Silicon (Si) is an important material in photoelectrochemical (PEC) water splitting because of its good light-harvesting capability as well as excellent charge-transport properties. However, the shallow valence band edge of Si hinders its PEC performance for water oxidation. Generally, thanks to their deep valence band edge, metal oxides are incorporated with Si to improve the performance, but they also decrease the transportation of carriers in the electrode. Here, we integrated a ferroelectric poly(vinylidene fluoride-trifluoroethylene) [P(VDF-TrFE)] layer with Si to increase the photovoltage as well as the saturated current density. Because of the prominent ferroelectric property from P(VDF-TrFE), the Schottky barrier between Si and the electrolyte can be facially tuned by manipulating the poling direction of the ferroelectric domains. The photovoltage is improved from 460 to 540 mV with a forward-poled P(VDF-TrFE) layer, while the current density increased from 5.8 to 12.4 mA/cm(2) at 1.23 V bias versus reversible hydrogen electrode.

  16. Gamma Irradiation and Oxidative Degradation of a Silica-Filled Silicone Elastomer

    SciTech Connect

    Labouriau, Andrea; Cady, Carl Mcelhinney; Gill, John T.; Stull, Jamie Ann; Ortiz-Acosta, Denisse; Henderson, Kevin C.; Hartung, Vaughn; Quintana, Adam; Celina, Mathew C.

    2015-03-21

    The radiation oxidative degradation of a commonly used silica-filled silicone elastomer DC745 was investigated by a series of experimental techniques. This elastomer is known to be chemically and thermally stable, but insufficient data exist on the radiation resistance. In the present work, gamma doses up to 200 kGy were applied under air at RT and 1Gy/s. Radiation chemical changes were investigated by NMR, FT-IR, Raman, and mass spectroscopy. DSC and TGA experiments probed thermal transitions and thermal stability changes with exposure dose. SEM probed variations on the surface of the elastomer, and solvent swelling methods were used to investigate changes in the polymer network properties. Electron paramagnetic resonance was employed to detect and identify free radicals. Uniaxial compression load tests at variable temperatures were performed to assess changes in the material’s mechanical response as a function of radiation dose. Results demonstrate that, with increasing exposure, DC745 undergoes changes in chemistry that lead to an increase in thermal stability and cross-link density, formation of free radical species, decrease in heat of fusion and increase in stiffness at low temperatures. Taken together, these results indicate that oxidative cross-linking is the dominant radiolysis mechanism that occurs when this material is exposed to gamma irradiation in air at high dose rates.

  17. Gamma Irradiation and Oxidative Degradation of a Silica-Filled Silicone Elastomer

    DOE PAGES

    Labouriau, Andrea; Cady, Carl Mcelhinney; Gill, John T.; Stull, Jamie Ann; Ortiz-Acosta, Denisse; Henderson, Kevin C.; Hartung, Vaughn; Quintana, Adam; Celina, Mathew C.

    2015-03-21

    The radiation oxidative degradation of a commonly used silica-filled silicone elastomer DC745 was investigated by a series of experimental techniques. This elastomer is known to be chemically and thermally stable, but insufficient data exist on the radiation resistance. In the present work, gamma doses up to 200 kGy were applied under air at RT and 1Gy/s. Radiation chemical changes were investigated by NMR, FT-IR, Raman, and mass spectroscopy. DSC and TGA experiments probed thermal transitions and thermal stability changes with exposure dose. SEM probed variations on the surface of the elastomer, and solvent swelling methods were used to investigate changesmore » in the polymer network properties. Electron paramagnetic resonance was employed to detect and identify free radicals. Uniaxial compression load tests at variable temperatures were performed to assess changes in the material’s mechanical response as a function of radiation dose. Results demonstrate that, with increasing exposure, DC745 undergoes changes in chemistry that lead to an increase in thermal stability and cross-link density, formation of free radical species, decrease in heat of fusion and increase in stiffness at low temperatures. Taken together, these results indicate that oxidative cross-linking is the dominant radiolysis mechanism that occurs when this material is exposed to gamma irradiation in air at high dose rates.« less

  18. Electromigration in aluminum/silicon/copper metallization due to the presence of a thin oxide layer

    NASA Astrophysics Data System (ADS)

    Koh, K. A.; Chua, S. J.

    1997-09-01

    The effect of a thin layer of SiO2 (50 nm) on the electromigration behavior of Al/ 0.8wt.%Si/0.5wt.%Cu metallization, passivated by spin-on-glass, phosphorus silicate glass and silicon nitride as part of the complementary metal oxide semiconductor technology fabrication process was studied. It is found that voids were formed along the edge of the metallization line as opposed to formation at triple point of grain boundaries. At the same stress current of 1 × 106 A/cm2, thicker metallization layer (600 nm) showed an improvement in median time to failure (MTF) (1.4 times) with smaller void size (0.2 to 0.4 μm) over one without an underlying oxide, whereas if the metallization thickness is thin (300 nm), the MTF is degraded (0.6 times) with larger void size formed (0.3 to 1.0 μm).

  19. Bismuth Passivation Technique for High-Resolution X-Ray Detectors

    NASA Technical Reports Server (NTRS)

    Chervenak, James; Hess, Larry

    2013-01-01

    The Athena-plus team requires X-ray sensors with energy resolution of better than one part in 3,000 at 6 keV X-rays. While bismuth is an excellent material for high X-ray stopping power and low heat capacity (for large signal when an X-ray is stopped by the absorber), oxidation of the bismuth surface can lead to electron traps and other effects that degrade the energy resolution. Bismuth oxide reduction and nitride passivation techniques analogous to those used in indium passivation are being applied in a new technique. The technique will enable improved energy resolution and resistance to aging in bismuth-absorber-coupled X-ray sensors. Elemental bismuth is lithographically integrated into X-ray detector circuits. It encounters several steps where the Bi oxidizes. The technology discussed here will remove oxide from the surface of the Bi and replace it with nitridized surface. Removal of the native oxide and passivating to prevent the growth of the oxide will improve detector performance and insulate the detector against future degradation from oxide growth. Placing the Bi coated sensor in a vacuum system, a reduction chemistry in a plasma (nitrogen/hydrogen (N2/H2) + argon) is used to remove the oxide and promote nitridization of the cleaned Bi surface. Once passivated, the Bi will perform as a better X-ray thermalizer since energy will not be trapped in the bismuth oxides on the surface. A simple additional step, which can be added at various stages of the current fabrication process, can then be applied to encapsulate the Bi film. After plasma passivation, the Bi can be capped with a non-diffusive layer of metal or dielectric. A non-superconducting layer is required such as tungsten or tungsten nitride (WNx).

  20. Deactivation of titanium dioxide photocatalyst by oxidation of polydimethylsiloxane and silicon sealant off-gas in a recirculating batch reactor.

    PubMed

    Chemweno, Maurice K; Cernohlavek, Leemer G; Jacoby, William A

    2008-01-01

    We have studied deactivation of titanium dioxide (TiO2) photocatalyst by oxidation of polydimethylsiloxane and silicone sealant off-gas in a recirculating batch reactor. Polydimethylsiloxane vapor is a model indoor air pollutant. It does not adsorb strongly on TiO2 in the dark, but undergoes oxidation when the ultraviolet (UV) photons are also present. Commercial silicone (room-temperature vulcanizing) sealant off-gas is an actual indoor air pollutant subject to short-term spikes in concentration. It does adsorb on the TiO2 surface in the dark, but UV photons also catalyze its oxidation. The oxidation of the Si-containing vapors was monitored using a Fourier transform infrared spectroscope equipped with a gas cell. Subsequent to each incremental exposure, a hexane oxidation reaction was performed to track the titania catalyst's activity. The exposures were repeated until substantial deactivation was achieved. We have also documented the regenerative effect of washing the catalyst surface with water. Surface science techniques were used to view the topography of the catalyst and to identify the elements causing the deactivation. Procedural observations of interest in the context of our recirculating batch reactor include the following: the rate of oxidation of hexane was used to assess the activity of a photocatalyst sample; hexane is an appropriate choice of a probe molecule because it does not adsorb in the dark and it undergoes photocatalytic oxidation (PCO) completely, forming CO2; and hexane does not deactivate the photocatalyst surface.

  1. PROCESS USING BISMUTH PHOSPHATE AS A CARRIER PRECIPITATE FOR FISSION PRODUCTS AND PLUTONIUM VALUES

    DOEpatents

    Finzel, T.G.

    1959-03-10

    A process is described for separating plutonium from fission products carried therewith when plutonium in the reduced oxidation state is removed from a nitric acid solution of irradiated uranium by means of bismuth phosphate as a carrier precipitate. The bismuth phosphate carrier precipitate is dissolved by treatment with nitric acid and the plutonium therein is oxidized to the hexavalent oxidation state by means of potassium dichromate. Separation of the plutonium from the fission products is accomplished by again precipitating bismuth phosphate and removing the precipitate which now carries the fission products and a small percentage of the plutonium present. The amount of plutonium carried in this last step may be minimized by addition of sodium fluoride, so as to make the solution 0.03N in NaF, prior to the oxidation and prccipitation step.

  2. Effect of graphene oxide ratio on the cell adhesion and growth behavior on a graphene oxide-coated silicon substrate

    PubMed Central

    Jeong, Jin-Tak; Choi, Mun-Ki; Sim, Yumin; Lim, Jung-Taek; Kim, Gil-Sung; Seong, Maeng-Je; Hyung, Jung-Hwan; Kim, Keun Soo; Umar, Ahmad; Lee, Sang-Kwon

    2016-01-01

    Control of living cells on biocompatible materials or on modified substrates is important for the development of bio-applications, including biosensors and implant biomaterials. The topography and hydrophobicity of substrates highly affect cell adhesion, growth, and cell growth kinetics, which is of great importance in bio-applications. Herein, we investigate the adhesion, growth, and morphology of cultured breast cancer cells on a silicon substrate, on which graphene oxides (GO) was partially formed. By minimizing the size and amount of the GO-containing solution and the further annealing process, GO-coated Si samples were prepared which partially covered the Si substrates. The coverage of GO on Si samples decreases upon annealing. The behaviors of cells cultured on two samples have been observed, i.e. partially GO-coated Si (P-GO) and annealed partially GO-coated Si (Annealed p-GO), with a different coverage of GO. Indeed, the spreading area covered by the cells and the number of cells for a given culture period in the incubator were highly dependent on the hydrophobicity and the presence of oxygenated groups on GO and Si substrates, suggesting hydrophobicity-driven cell growth. Thus, the presented method can be used to control the cell growth via an appropriate surface modification. PMID:27652886

  3. Effect of graphene oxide ratio on the cell adhesion and growth behavior on a graphene oxide-coated silicon substrate

    NASA Astrophysics Data System (ADS)

    Jeong, Jin-Tak; Choi, Mun-Ki; Sim, Yumin; Lim, Jung-Taek; Kim, Gil-Sung; Seong, Maeng-Je; Hyung, Jung-Hwan; Kim, Keun Soo; Umar, Ahmad; Lee, Sang-Kwon

    2016-09-01

    Control of living cells on biocompatible materials or on modified substrates is important for the development of bio-applications, including biosensors and implant biomaterials. The topography and hydrophobicity of substrates highly affect cell adhesion, growth, and cell growth kinetics, which is of great importance in bio-applications. Herein, we investigate the adhesion, growth, and morphology of cultured breast cancer cells on a silicon substrate, on which graphene oxides (GO) was partially formed. By minimizing the size and amount of the GO-containing solution and the further annealing process, GO-coated Si samples were prepared which partially covered the Si substrates. The coverage of GO on Si samples decreases upon annealing. The behaviors of cells cultured on two samples have been observed, i.e. partially GO-coated Si (P-GO) and annealed partially GO-coated Si (Annealed p-GO), with a different coverage of GO. Indeed, the spreading area covered by the cells and the number of cells for a given culture period in the incubator were highly dependent on the hydrophobicity and the presence of oxygenated groups on GO and Si substrates, suggesting hydrophobicity-driven cell growth. Thus, the presented method can be used to control the cell growth via an appropriate surface modification.

  4. Transparent conducting oxide contacts and textured metal back reflectors for thin film silicon solar cells

    NASA Astrophysics Data System (ADS)

    Franken, R. H.-J.

    2006-09-01

    With the growing population and the increasing environmental problems of the 'common' fossil and nuclear energy production, the need for clean and sustainable energy sources is evident. Solar energy conversion, such as in photovoltaic (PV) systems, can play a major role in the urgently needed energy transition in electricity production. At the present time PV module production is dominated by the crystalline wafer technology. Thin film silicon technology is an alternative solar energy technology that operates at lower efficiencies, however, it has several significant advantages, such as the possibility of deposition on cheap (flexible) substrates and the much smaller silicon material consumption. Because of the small thickness of the solar cells, light trapping schemes are needed in order to obtain enough light absorption and current generation. This thesis describes the research on thin film silicon solar cells with the focus on the optimization of the transparent conducting oxide (TCO) layers and textured metal Ag substrate layers for the use as enhanced light scattering back reflectors in n-i-p type of solar cells. First we analyzed ZnO:Al (TCO) layers deposited in an radio frequent (rf) magnetron deposition system equipped with a 7 inch target. We have focused on the improvement of the electrical properties without sacrificing the optical properties by increasing the mobility and decreasing the grain boundary density. Furthermore, we described some of the effects on light trapping of ZnO:Al enhanced back reflectors. The described effects are able to explain the observed experimental data. Furthermore, we present a relation between the surface morphology of the Ag back contact and the current enhancement in microcrystalline (muc-Si:H) solar cells. We show the importance of the lateral feature sizes of the Ag surface on the light scattering and introduce a method to characterize the quality of the back reflector by combining the vertical and lateral feature sizes

  5. Growth and Characterization of Bismuth and Antimony Thin Films

    NASA Astrophysics Data System (ADS)

    Martinez, A.; Berrios, A. R.; Collazo, R.; Garcia, J. L.; Ducoudray, G. O.

    1996-03-01

    We have grown thin films of bismuth and antimony using hot wall epitaxy. The polycrystalline films were grown onto (111)-silicon substrates. The chemical integrity of the films was established using Auger electron spectroscopy. The crystallographical properties of the films were assessed using x-ray diffraction techniques. We will report on the results of these characterization efforts, as well as, on the growth apparatus and process. Work supported in part by NSWC-CRADA 93-01 and EPSCoR-NSF Grant EHR-9108775

  6. Hexagonal Ag nanoarrays induced enhancement of blue light emission from amorphous oxidized silicon nitride via localized surface plasmon coupling.

    PubMed

    Ma, Zhongyuan; Ni, Xiaodong; Zhang, Wenping; Jiang, Xiaofan; Yang, Huafeng; Yu, Jie; Wang, Wen; Xu, Ling; Xu, Jun; Chen, Kunji; Feng, Duan

    2014-11-17

    A significant enhancement of blue light emission from amorphous oxidized silicon nitride (a-SiNx:O) films is achieved by introduction of ordered and size-controllable arrays of Ag nanoparticles between the silicon substrate and a-SiNx:O films. Using hexagonal arrays of Ag nanoparticles fabricated by nanosphere lithography, the localized surface plasmons (LSPs) resonance can effectively increase the internal quantum efficiency from 3.9% to 13.3%. Theoretical calculation confirms that the electromagnetic field-intensity enhancement is through the dipole surface plasma coupling with the excitons of a-SiNx:O films, which demonstrates a-SiNx:O films with enhanced blue emission are promising for silicon-based light-emitting applications by patterned Ag arrays.

  7. [Synergetic effects of silicon carbide and molecular sieve loaded catalyst on microwave assisted catalytic oxidation of toluene].

    PubMed

    Wang, Xiao-Hui; Bo, Long-Li; Liu, Hai-Nan; Zhang, Hao; Sun, Jian-Yu; Yang, Li; Cai, Li-Dong

    2013-06-01

    Molecular sieve loaded catalyst was prepared by impregnation method, microwave-absorbing material silicon carbide and the catalyst were investigated for catalytic oxidation of toluene by microwave irradiation. Research work examined effects of silicon carbide and molecular sieve loading Cu-V catalyst's mixture ratio as well as mixed approach changes on degradation of toluene, and characteristics of catalyst were measured through scanning electron microscope, specific surface area test and X-ray diffraction analysis. The result showed that the fixed bed reactor had advantages of both thermal storage property and low-temperature catalytic oxidation when 20% silicon carbide was filled at the bottom of the reactor, and this could effectively improve the utilization of microwave energy as well as catalytic oxidation efficiency of toluene. Under microwave power of 75 W and 47 W, complete-combustion temperatures of molecular sieve loaded Cu-V catalyst and Cu-V-Ce catalyst to toluene were 325 degrees C and 160 degrees C, respectively. Characteristics of the catalysts showed that mixture of rare-earth element Ce increased the dispersion of active components in the surface of catalyst, micropore structure of catalyst effectively guaranteed high adsorption capacity for toluene, while amorphous phase of Cu and V oxides increased the activity of catalyst greatly.

  8. Tunnel oxide passivated contacts formed by ion implantation for applications in silicon solar cells

    SciTech Connect

    Reichel, Christian; Feldmann, Frank; Müller, Ralph; Hermle, Martin; Glunz, Stefan W.; Reedy, Robert C.; Lee, Benjamin G.; Young, David L.; Stradins, Paul

    2015-11-28

    Passivated contacts (poly-Si/SiO{sub x}/c-Si) doped by shallow ion implantation are an appealing technology for high efficiency silicon solar cells, especially for interdigitated back contact (IBC) solar cells where a masked ion implantation facilitates their fabrication. This paper presents a study on tunnel oxide passivated contacts formed by low-energy ion implantation into amorphous silicon (a-Si) layers and examines the influence of the ion species (P, B, or BF{sub 2}), the ion implantation dose (5 × 10{sup 14 }cm{sup −2} to 1 × 10{sup 16 }cm{sup −2}), and the subsequent high-temperature anneal (800 °C or 900 °C) on the passivation quality and junction characteristics using double-sided contacted silicon solar cells. Excellent passivation quality is achieved for n-type passivated contacts by P implantations into either intrinsic (undoped) or in-situ B-doped a-Si layers with implied open-circuit voltages (iV{sub oc}) of 725 and 720 mV, respectively. For p-type passivated contacts, BF{sub 2} implantations into intrinsic a-Si yield well passivated contacts and allow for iV{sub oc} of 690 mV, whereas implanted B gives poor passivation with iV{sub oc} of only 640 mV. While solar cells featuring in-situ B-doped selective hole contacts and selective electron contacts with P implanted into intrinsic a-Si layers achieved V{sub oc} of 690 mV and fill factor (FF) of 79.1%, selective hole contacts realized by BF{sub 2} implantation into intrinsic a-Si suffer from drastically reduced FF which is caused by a non-Ohmic Schottky contact. Finally, implanting P into in-situ B-doped a-Si layers for the purpose of overcompensation (counterdoping) allowed for solar cells with V{sub oc} of 680 mV and FF of 80.4%, providing a simplified and promising fabrication process for IBC solar cells featuring passivated contacts.

  9. On the role of Yb as an impurity in the excitation of Er 3+ emission in silicon-rich silicon oxide

    NASA Astrophysics Data System (ADS)

    Kozanecki, A.; Kuritsyn, D.; Jantsch, W.

    2006-05-01

    The aim of this work is to check if Yb 3+ ions can be used as sensitizers for the 4I 13/2- 4I 15/2 emission of Er 3+ ions at 1.54 μm in silicon-rich silicon oxide (SRSO). To answer this question, photoluminescence excitation (PLE) experiments were performed on the Er 3+ emission in a wide range of excitation wavelengths. The PLE spectra in the 420-650 nm range were excited using an optical parametric oscillator. In Er + Yb implanted silica we found an absorption band related to Yb at wavelengths shorter than 530 nm. Radiation defects were excluded as absorbing species in this range of wavelengths. In SRSO PLE by Yb is entirely suppressed by absorption due to silicon nanoclusters. As a result we conclude that Yb doping of SRSO:Er does not improve the PL efficiency of Er 3+ in comparison with SRSO:Er. We interpret a sensitization mechanism by Yb in the UV-green range in terms of the Yb 2+ → Yb 3+ recharging process, in which an Yb ion becomes excited into its 2+ state, leaving a hole, hVB, localized near Yb 2+. Recombination with a hole leaves Yb 3+ in its 2F 5/2 excited state from which energy is very efficiently transferred to Er 3+ ions.

  10. Effects of fine metal oxide particle dopant on the acoustic properties of silicone rubber lens for medical array probe.

    PubMed

    Hosono, Yasuharu; Yamashita, Yohachi; Itsumi, Kazuhiro

    2007-08-01

    The effects of fine metal oxide particles, particularly those of high-density elements (7.7 to 9.7 x 10(3) kg/m3), on the acoustic properties of silicone rubber have been investigated in order to develop an acoustic lens with a low acoustic attenuation. Silicone rubber doped with Yb2O3 powder having nanoparticle size of 16 nm showed a lower acoustic attenuation than silicone rubber doped with powders of CeO2, Bi2O3, Lu2O3 and HfO2. The silicone rubber doped with Yb2O3 powder showed a sound speed of 0.88 km/s, an acoustic impedance of 1.35 x 10(6) kg/m2s, an acoustic attenuation of 0.93 dB/mmMHz, and a Shore A hardness of 55 at 37 degrees C. Although typical silicone rubber doped with SiO2 (2.6 x 10(3) kg/m3) shows a sound speed of about 1.00 km/s, heavy metal oxide particles decreased the sound velocities to lower than 0.93 km/s. Therefore, an acoustic lens of silicone rubber doped with Yb2O3 powder provides increased sensitivity because it realizes a thinner acoustic lens than is conventionally used due to its low sound speed. Moreover, it has an advantage in that a focus point is not changed when the acoustic lens is pressed to a human body due to its reasonable hardness.

  11. Comparison between transient and frequency modulated excitation: application to silicon nitride and aluminum oxide coatings of silicon.

    PubMed

    Klein, D; Ohm, W; Fengler, S; Kunst, M

    2014-06-01

    Contactless measurements of the lifetime of charge carriers are presented with varying ways of photo excitation: with and without bias light and pulsed and frequency modulated. These methods are applied to the study of the surface passivation of single crystalline silicon by a-SiN(x):H and Al2O3 coatings. The properties of these coatings are investigated under consideration of the merits of the different methods.

  12. Oxidation Behavior of Germanium- and/or Silicon-Bearing Near-α Titanium Alloys in Air

    NASA Astrophysics Data System (ADS)

    Kitashima, Tomonori; Yamabe-Mitarai, Yoko

    2015-06-01

    The effect of germanium (Ge) and/or silicon (Si) addition on the oxidation behavior of the near-α alloy Ti-5Al-2Sn-4Zr-2Mo was investigated in air at 973 K (700 °C). Ge addition decreased the oxidation resistance because of the formation of a Ge-rich layer in the substrate at the TiO2/substrate interface, enhancing Sn segregation at the interface. In addition, a small amount of Ge dissolved in the external Al2O3 layer. These results reduced the aluminum activity at the interface, suppressed the formation of Al2O3, and increased the diffusivity of oxygen in the oxide scales. The addition of 0.2 and 0.9 wt pct Si was beneficial for improving oxidation resistance. The effect of germanide and silicide precipitates in the matrix on the oxide growth process was also discussed.

  13. A Silicon-Based Nanothin Film Solid Oxide Fuel Cell Array with Edge Reinforced Support for Enhanced Thermal Mechanical Stability.

    PubMed

    Baek, Jong Dae; Yu, Chen-Chiang; Su, Pei-Chen

    2016-04-13

    A silicon-based micro-solid oxide fuel cell (μ-SOFC) with electrolyte membrane array embedded in a thin silicon supporting membrane, featuring a unique edge reinforcement structure, was demonstrated by utilizing simple silicon micromachining processes. The square silicon supporting membrane, fabricated by combining deep reactive ion etching and through-wafer wet etching processes, has thicker edges and corners than the center portion of the membrane, which effectively improved the mechanical stability of the entire fuel cell array during cell fabrication and cell operation. The 20 μm thick single crystalline silicon membrane supports a large number of 80 nm thick free-standing yttria-stabilized zirconia (YSZ) electrolytes. The fuel cell array was stably maintained at the open circuit voltage (OCV) of 1.04 V for more than 30 h of operation at 350 °C. A high peak power density of 317 mW/cm(2) was obtained at 400 °C. During a rigorous in situ thermal cycling between 150 and 400 °C at a fast cooling and heating rate of 25 °C/min, the OCV of the μ-SOFC recovered to its high value of 1.07 V without any drop caused by membrane failure, which justifies the superior thermal stability of this novel cell architecture.

  14. A Silicon-Based Nanothin Film Solid Oxide Fuel Cell Array with Edge Reinforced Support for Enhanced Thermal Mechanical Stability.

    PubMed

    Baek, Jong Dae; Yu, Chen-Chiang; Su, Pei-Chen

    2016-04-13

    A silicon-based micro-solid oxide fuel cell (μ-SOFC) with electrolyte membrane array embedded in a thin silicon supporting membrane, featuring a unique edge reinforcement structure, was demonstrated by utilizing simple silicon micromachining processes. The square silicon supporting membrane, fabricated by combining deep reactive ion etching and through-wafer wet etching processes, has thicker edges and corners than the center portion of the membrane, which effectively improved the mechanical stability of the entire fuel cell array during cell fabrication and cell operation. The 20 μm thick single crystalline silicon membrane supports a large number of 80 nm thick free-standing yttria-stabilized zirconia (YSZ) electrolytes. The fuel cell array was stably maintained at the open circuit voltage (OCV) of 1.04 V for more than 30 h of operation at 350 °C. A high peak power density of 317 mW/cm(2) was obtained at 400 °C. During a rigorous in situ thermal cycling between 150 and 400 °C at a fast cooling and heating rate of 25 °C/min, the OCV of the μ-SOFC recovered to its high value of 1.07 V without any drop caused by membrane failure, which justifies the superior thermal stability of this novel cell architecture. PMID:26990604

  15. Role of surface oxides in the formation of solid-electrolyte interphases at silicon electrodes for lithium-ion batteries.

    PubMed

    Schroder, Kjell W; Dylla, Anthony G; Harris, Stephen J; Webb, Lauren J; Stevenson, Keith J

    2014-12-10

    Nonaqueous solvents in modern battery technologies undergo electroreduction at negative electrodes, leading to the formation of a solid-electrolyte interphase (SEI). The mechanisms and reactions leading to a stable SEI on silicon electrodes in lithium-ion batteries are still poorly understood. This lack of understanding inhibits the rational design of electrolyte additives, active material coatings, and the prediction of Li-ion battery life in general. We prepared SEI with a common nonaqueous solvent (LiPF6 in PC and in EC/DEC 1:1 by wt %) on silicon oxide and etched silicon (001) surfaces in various states of lithiation to understand the role of surface chemistry on the SEI formation mechanism and SEI structure. Anhydrous and anoxic techniques were used to prevent air and moisture contamination of prepared SEI films, allowing for more accurate characterization of SEI chemical stratification and composition by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (TOF-SIMS) depth profiling. Additionally, multivariate statistical methods were used to better understand TOF-SIMS depth profiling studies. We conclude that the absence of native-oxide layer on silicon has a significant impact on the formation, composition, structure, and thickness of the SEI. PMID:25402271

  16. Auger and X-ray PhotoelectronSpectroscopy Study of the Density ofOxygen States in Bismuth, Aluminum, Silicon, and Uranium Oxides

    SciTech Connect

    Teterin, Yu A.; Ivanov, K.E.; Teterin, A. Yu; Lebedev, A.M.; Utkin, I.O.; Vukchevich, L.

    1998-08-03

    The correlation of relative partial electron density at the oxygen ions with the intensity of Auger O KLL lines in Bi2O3, Al2O3, SiO2 and UO2 has been determined by Auger and X-ray photoelectron spectroscopic methods. The dependence of the relative intensities of Auger O KL2-3L2-3 and O KL1L2-3-lines was characterized from the binding energy of O 1s electrons. The electron density of the outer valence levels of oxygen increases as the relative intensities of Anger OKL2-3L2-3 and O KL1L2-3-lines increase. The fine structure observed in the O KL1L2-3 Auger and the O 2s XPS spectra has been explained by the formation of inner valence molecular orbitals (IVMO) from the interaction of electrons of the O 2s and filled metal ns shells.

  17. On the photoluminescence of as-deposited Tb-doped silicon oxides and oxynitrides fabricated by ECR-PECVD

    NASA Astrophysics Data System (ADS)

    Ramírez, J. M.; Wojcik, J.; Berencén, Y.; Mascher, P.; Garrido, B.

    2014-05-01

    In-situ doping of Tb3+ ions in silicon oxides and oxynitrides deposited by electron-cyclotron-resonance plasma enhanced chemical-vapour (ECR-PECVD) has been performed. Oxygen and nitrogen gas flow rates were changed to produce a gradual substitution of oxygen by nitrogen in the host matrix. Bright green luminescence from as-deposited layers is observed by the naked eye under daylight conditions. Tbdoped nitrogen-rich samples showed a considerable photoluminescence (PL) enhancement compared to Tb-doped silicon oxides. An optimum layer composition for efficient Tb3+ excitation under non-resonant optical pumping is obtained. The combination of a low temperature treatment with bright luminescence could be instrumental for the development of light emitting devices in other platforms with more restrictive temperature requirements.

  18. Electronic devices containing switchably conductive silicon oxides as a switching element and methods for production and use thereof

    DOEpatents

    Tour, James M.; Yao, Jun; Natelson, Douglas; Zhong, Lin; He, Tao

    2015-09-08

    In various embodiments, electronic devices containing switchably conductive silicon oxide as a switching element are described herein. The electronic devices are two-terminal devices containing a first electrical contact and a second electrical contact in which at least one of the first electrical contact or the second electrical contact is deposed on a substrate to define a gap region therebetween. A switching layer containing a switchably conductive silicon oxide resides in the gap region between the first electrical contact and the second electrical contact. The electronic devices exhibit hysteretic current versus voltage properties, enabling their use in switching and memory applications. Methods for configuring, operating and constructing the electronic devices are also presented herein.

  19. Electronic devices containing switchably conductive silicon oxides as a switching element and methods for production and use thereof

    DOEpatents

    Tour, James M; Yao, Jun; Natelson, Douglas; Zhong, Lin; He, Tao

    2013-11-26

    In various embodiments, electronic devices containing switchably conductive silicon oxide as a switching element are described herein. The electronic devices are two-terminal devices containing a first electrical contact and a second electrical contact in which at least one of the first electrical contact or the second electrical contact is deposed on a substrate to define a gap region therebetween. A switching layer containing a switchably conductive silicon oxide resides in the the gap region between the first electical contact and the second electrical contact. The electronic devices exhibit hysteretic current versus voltage properties, enabling their use in switching and memory applications. Methods for configuring, operating and constructing the electronic devices are also presented herein.

  20. High-contrast visualization of graphene oxide on dye-sensitized glass, quartz, and silicon by fluorescence quenching.

    PubMed

    Treossi, Emanuele; Melucci, Manuela; Liscio, Andrea; Gazzano, Massimo; Samorì, Paolo; Palermo, Vincenzo

    2009-11-01

    We present a novel approach for detecting and visualizing graphene oxide (GO) with high contrast on different substrates, including glass, quartz, and silicon. Visualization of GO sheets is accomplished through quenching the fluorescence of a thiophene dye, giving high optical contrast without the need to use interference methods. A comparison of fluorescence, AFM, and XRD measurements confirmed that even a single GO sheet can completely quench the fluorescence and thus be quickly visualized.

  1. Effects of silicon nanostructure evolution on Er{sup 3+} luminescence in silicon-rich silicon oxide/Er-doped silica multilayers

    SciTech Connect

    Chang, Jee Soo; Jhe, Ji-Hong; Yang, Moon-Seung; Shin, Jung H.; Kim, Kyung Joong; Moon, Dae Won

    2006-10-30

    The effect of silicon nanostructure evolution on Er{sup 3+} luminescence is investigated by using multilayers of 2.5 nm thin SiO{sub x} (x<2) and 10 nm thin Er-doped silica (SiO{sub 2}:Er). By separating excess Si and Er atoms into separate, nanometer-thin layers, the effect of silicon nanostructure evolution on np-Si sensitized Er{sup 3+} luminescence could be investigated while keeping the microscopic Er{sup 3+} environment the same. The authors find that while the presence of np-Si is necessary for efficient sensitization, the overall quality of np-Si layer has little effect on the Er{sup 3+} luminescence. On the other hand, intrusion of np-Si into Er-doped silica layers leads to deactivation of np-Si/Er{sup 3+} interaction, suggesting that there is a limit to excess Si and Er contents that can be used.

  2. Nanostructured Indium Oxide Coated Silicon Nanowire Arrays: A Hybrid Photothermal/Photochemical Approach to Solar Fuels.

    PubMed

    Hoch, Laura B; O'Brien, Paul G; Jelle, Abdinoor; Sandhel, Amit; Perovic, Douglas D; Mims, Charles A; Ozin, Geoffrey A

    2016-09-27

    The field of solar fuels seeks to harness abundant solar energy by driving useful molecular transformations. Of particular interest is the photodriven conversion of greenhouse gas CO2 into carbon-based fuels and chemical feedstocks, with the ultimate goal of providing a sustainable alternative to traditional fossil fuels. Nonstoichiometric, hydroxylated indium oxide nanoparticles, denoted In2O3-x(OH)y, have been shown to function as active photocatalysts for CO2 reduction to CO via the reverse water gas shift reaction under simulated solar irradiation. However, the relatively wide band gap (2.9 eV) of indium oxide restricts the portion of the solar irradiance that can be utilized to ∼9%, and the elevated reaction temperatures required (150-190 °C) reduce the overall energy efficiency of the process. Herein we report a hybrid catalyst consisting of a vertically aligned silicon nanowire (SiNW) support evenly coated by In2O3-x(OH)y nanoparticles that utilizes the vast majority of the solar irradiance to simultaneously produce both the photogenerated charge carriers and heat required to reduce CO2 to CO at a rate of 22.0 μmol·gcat(-1)·h(-1). Further, improved light harvesting efficiency of the In2O3-x(OH)y/SiNW films due to minimized reflection losses and enhanced light trapping within the SiNW support results in a ∼6-fold increase in photocatalytic conversion rates over identical In2O3-x(OH)y films prepared on roughened glass substrates. The ability of this In2O3-x(OH)y/SiNW hybrid catalyst to perform the dual function of utilizing both light and heat energy provided by the broad-band solar irradiance to drive CO2 reduction reactions represents a general advance that is applicable to a wide range of catalysts in the field of solar fuels. PMID:27598429

  3. Nanostructured Indium Oxide Coated Silicon Nanowire Arrays: A Hybrid Photothermal/Photochemical Approach to Solar Fuels.

    PubMed

    Hoch, Laura B; O'Brien, Paul G; Jelle, Abdinoor; Sandhel, Amit; Perovic, Douglas D; Mims, Charles A; Ozin, Geoffrey A

    2016-09-27

    The field of solar fuels seeks to harness abundant solar energy by driving useful molecular transformations. Of particular interest is the photodriven conversion of greenhouse gas CO2 into carbon-based fuels and chemical feedstocks, with the ultimate goal of providing a sustainable alternative to traditional fossil fuels. Nonstoichiometric, hydroxylated indium oxide nanoparticles, denoted In2O3-x(OH)y, have been shown to function as active photocatalysts for CO2 reduction to CO via the reverse water gas shift reaction under simulated solar irradiation. However, the relatively wide band gap (2.9 eV) of indium oxide restricts the portion of the solar irradiance that can be utilized to ∼9%, and the elevated reaction temperatures required (150-190 °C) reduce the overall energy efficiency of the process. Herein we report a hybrid catalyst consisting of a vertically aligned silicon nanowire (SiNW) support evenly coated by In2O3-x(OH)y nanoparticles that utilizes the vast majority of the solar irradiance to simultaneously produce both the photogenerated charge carriers and heat required to reduce CO2 to CO at a rate of 22.0 μmol·gcat(-1)·h(-1). Further, improved light harvesting efficiency of the In2O3-x(OH)y/SiNW films due to minimized reflection losses and enhanced light trapping within the SiNW support results in a ∼6-fold increase in photocatalytic conversion rates over identical In2O3-x(OH)y films prepared on roughened glass substrates. The ability of this In2O3-x(OH)y/SiNW hybrid catalyst to perform the dual function of utilizing both light and heat energy provided by the broad-band solar irradiance to drive CO2 reduction reactions represents a general advance that is applicable to a wide range of catalysts in the field of solar fuels.

  4. Self-assembly-induced formation of high-density silicon oxide memristor nanostructures on graphene and metal electrodes.

    PubMed

    Park, Woon Ik; Yoon, Jong Moon; Park, Moonkyu; Lee, Jinsup; Kim, Sung Kyu; Jeong, Jae Won; Kim, Kyungho; Jeong, Hu Young; Jeon, Seokwoo; No, Kwang Soo; Lee, Jeong Yong; Jung, Yeon Sik

    2012-03-14

    We report the direct formation of ordered memristor nanostructures on metal and graphene electrodes by a block copolymer self-assembly process. Optimized surface functionalization provides stacking structures of Si-containing block copolymer thin films to generate uniform memristor device structures. Both the silicon oxide film and nanodot memristors, which were formed by the plasma oxidation of the self-assembled block copolymer thin films, presented unipolar switching behaviors with appropriate set and reset voltages for resistive memory applications. This approach offers a very convenient pathway to fabricate ultrahigh-density resistive memory devices without relying on high-cost lithography and pattern-transfer processes.

  5. Performance enhancement of ITO/oxide/semiconductor MOS-structure silicon solar cells with voltage biasing

    NASA Astrophysics Data System (ADS)

    Ho, Wen-Jeng; Huang, Min-Chun; Lee, Yi-Yu; Hou, Zhong-Fu; Liao, Changn-Jyun

    2014-12-01

    In this study, we demonstrate the photovoltaic performance enhancement of a p-n junction silicon solar cell using a transparent-antireflective ITO/oxide film deposited on the spacing of the front-side finger electrodes and with a DC voltage applied on the ITO-electrode. The depletion width of the p-n junction under the ITO-electrode was induced and extended while the absorbed volume and built-in electric field were also increased when the biasing voltage was increased. The photocurrent and conversion efficiency were increased because more photo-carriers are generated in a larger absorbed volume and because the carriers transported and collected more effectively due to higher biasing voltage effects. Compared to a reference solar cell (which was biased at 0 V), a conversion efficiency enhancement of 26.57% (from 12.42% to 15.72%) and short-circuit current density enhancement of 42.43% (from 29.51 to 42.03 mA/cm2) were obtained as the proposed MOS-structure solar cell biased at 2.5 V. In addition, the capacitance-volt (C-V) measurement was also used to examine the mechanism of photovoltaic performance enhancement due to the depletion width being enlarged by applying a DC voltage on an ITO-electrode.

  6. Aluminum oxide passivated radial junction sub-micrometre pillar array textured silicon solar cells

    NASA Astrophysics Data System (ADS)

    Pudasaini, Pushpa Raj; Elam, David; Ayon, Arturo A.

    2013-06-01

    We report radial, p-n junction, sub-micrometre, pillar array textured solar cells, fabricated on an n-type Czochralski silicon wafer. Relatively simple processing schemes such as metal-assisted chemical etching and spin on dopant techniques were employed for the fabrication of the proposed solar cells. Atomic layer deposition (ALD) grown aluminum oxide (Al2O3) was employed as a surface passivation layer on the B-doped emitter surface. In spite of the fact that the sub-micrometre pillar array textured surface has a relatively high surface-to-volume ratio, we observed an open circuit voltage (VOC) and a short circuit current density (JSC) as high as 572 mV and 29.9 mA cm-2, respectively, which leads to a power conversion efficiency in excess of 11.30%, for the optimized structure of the solar cell described herein. Broadband omnidirectional antireflection effects along with the light trapping property of the sub-micrometre, pillar array textured surface and the excellent passivation quality of the ALD-grown Al2O3 on the B-doped emitter surface were responsible for the enhanced electrical performance of the proposed solar cells.

  7. Seed-layer-free hydrothermal growth of zinc oxide nanorods on porous silicon

    NASA Astrophysics Data System (ADS)

    Kim, Soaram; Kim, Min Su; Park, Hyunggil; Nam, Giwoong; Yoon, Hyunsik; Leem, Jae-Young

    2014-05-01

    Zinc oxide (ZnO) nanorods were grown on porous silicon (PS) using hydrothermal synthesis without a metal catalyst or a seed layer. Scanning electron microscopy, x-ray diffraction, and temperature-dependent photoluminescence (PL) were carried out to investigate the structural and optical properties of the ZnO-PS sample. Most of the nanorods had an average diameter about of 120 nm and an average length of 5 µm, and were assembled into flower-like clusters where several nanorods were joined at a central point. In some cases, ZnO nanorods were merged in parallel bundles. The ZnO nanorods exhibited an overall compressive residual stress. The Zn-O bond length was 1.953 Å. ZnO-PS exhibited one PL peak in the ultraviolet (UV) range, and two peaks in the visible range. The UV and green emission peak were generated from the ZnO nanorods, while the red emission peak was attributed to the PS. The fitting parameters for Varshni's empirical equation were α = 8 × 10-4 eV/K, β = 186 K, and E g (0) = 3.375 eV, and the thermal activation energy was about 32 meV.

  8. Observation of Nanometric Silicon Oxide Bifilms in a Water-Atomized Hypereutectic Cast Iron Powder

    NASA Astrophysics Data System (ADS)

    Boisvert, Mathieu; Christopherson, Denis; L'Espérance, Gilles

    2016-10-01

    This study investigated the reasons for the irregular structure of primary graphite nodules that were formed in a hypereutectic cast iron powder during water atomization. The graphite nodules contain a significant amount of micron-sized pores and multiple nanometric voids that formed from silicon oxide bifilms. The bifilms theory is often used to explain the mechanisms responsible for the presence of pores in castings. However, even if many results presented in the literature tend to corroborate the existence of bifilms, to this date, only indirect evidences of their existence were presented. The observations presented in this paper are the first to show the double-sided nature of these defects. These observations support the bifilms theory and give an explanation for the presence of porosities in castings. The bifilms were used as substrate for graphite growth during solidification. The irregular structure of the graphite nodules is a consequence of the rather random structure of the bifilms that were introduced in the melt as a result of turbulences on the surface of the melt during pouring. The confirmation of the existence of bifilms can contribute to the understanding of the mechanical properties of various metallic parts.

  9. Selective growth of vertical silicon nanowire array guided by anodic aluminum oxide template

    NASA Astrophysics Data System (ADS)

    Hoang Nguyen, Van; Hoshi, Yusuke; Usami, Noritaka; Konagai, Makoto

    2015-09-01

    We report on the selective growth of vertical silicon nanowire arrays guided by an anodic aluminum oxide (AAO) template without the introduction of any metallic catalyst. Gas-source molecular beam epitaxy using disilane as a source gas was carried out. The growth conditions such as flow rate and growth temperature were changed to optimize the Si nanowire growth. It was found that the selective growth was promoted at a flow rate of 0.5 sccm, whereas the selective growth was poor at high flow rates of 1 and 2 sccm. One-micrometer-long Si nanowire arrays were obtained at a low flow rate of 0.5 sccm only at the growth temperature of 700 °C. The obtained Si grown at a temperature of 650 °C exhibited conglomerated structures with Si grains piled up inside the nanopores of the AAO template. We found that increasing the growth temperature and decreasing the flow rate are useful for improving the growth selectivity.

  10. Observation of Nanometric Silicon Oxide Bifilms in a Water-Atomized Hypereutectic Cast Iron Powder

    NASA Astrophysics Data System (ADS)

    Boisvert, Mathieu; Christopherson, Denis; L'Espérance, Gilles

    2016-06-01

    This study investigated the reasons for the irregular structure of primary graphite nodules that were formed in a hypereutectic cast iron powder during water atomization. The graphite nodules contain a significant amount of micron-sized pores and multiple nanometric voids that formed from silicon oxide bifilms. The bifilms theory is often used to explain the mechanisms responsible for the presence of pores in castings. However, even if many results presented in the literature tend to corroborate the existence of bifilms, to this date, only indirect evidences of their existence were presented. The observations presented in this paper are the first to show the double-sided nature of these defects. These observations support the bifilms theory and give an explanation for the presence of porosities in castings. The bifilms were used as substrate for graphite growth during solidification. The irregular structure of the graphite nodules is a consequence of the rather random structure of the bifilms that were introduced in the melt as a result of turbulences on the surface of the melt during pouring. The confirmation of the existence of bifilms can contribute to the understanding of the mechanical properties of various metallic parts.

  11. Complementary metal oxide semiconductor-compatible silicon nanowire biofield-effect transistors as affinity biosensors.

    PubMed

    Duan, Xuexin; Rajan, Nitin K; Izadi, Mohammad Hadi; Reed, Mark A

    2013-11-01

    Affinity biosensors use biorecognition elements and transducers to convert a biochemical event into a recordable signal. They provides the molecule binding information, which includes the dynamics of biomolecular association and dissociation, and the equilibrium association constant. Complementary metal oxide semiconductor-compatible silicon (Si) nanowires configured as a field-effect transistor (NW FET) have shown significant advantages for real-time, label-free and highly sensitive detection of a wide range of biomolecules. Most research has focused on reducing the detection limit of Si-NW FETs but has provided less information about the real binding parameters of the biomolecular interactions. Recently, Si-NW FETs have been demonstrated as affinity biosensors to quantify biomolecular binding affinities and kinetics. They open new applications for NW FETs in the nanomedicine field and will bring such sensor technology a step closer to commercial point-of-care applications. This article summarizes the recent advances in bioaffinity measurement using Si-NW FETs, with an emphasis on the different approaches used to address the issues of sensor calibration, regeneration, binding kinetic measurements, limit of detection, sensor surface modification, biomolecule charge screening, reference electrode integration and nonspecific molecular binding.

  12. Plasma enhanced chemical vapor deposition of silicon oxide films with divinyldimethylsilane and tetravinylsilane

    SciTech Connect

    Park, Sung-Gyu; Rhee, Shi-Woo

    2006-03-15

    Carbon-doped silicon oxide (SiCOH) low-k films were deposited with plasma enhanced chemical vapor deposition (PECVD) using divinyldimethylsilane (DVDMS) with two vinyl groups and tetravinylsilane (TVS) with four vinyl groups compared with vinyltrimethylsilane (VTMS) with one vinyl group. With more vinyl groups in the precursor, due to the crosslinking of the vinyl groups, the film contains more of an organic phase and organic phase became less volatile. It was confirmed that the deposition rate, refractive index, and k value increase with more vinyl groups in the precursor molecule. After annealing, the SiCOH films deposited with DVDMS and TVS showed a low dielectric constant of 2.2 and 2.4 at optimum conditions, respectively. In both cases, the annealed film had low leakage current density (J=6.7x10{sup -7} A/cm{sup 2} for SiCOH film of DVDMS and J=1.18x10{sup -8} A/cm{sup 2} for SiCOH film of TVS at 1 MV/cm) and relatively high breakdown field strength (E>4.0 MV/cm at 1 mA/cm{sup 2}), which is comparable to those of PECVD SiO{sub 2}.

  13. Investigations of nanocomposite magnetic materials based on the oxides of iron, nickel, cobalt and silicon dioxide

    NASA Astrophysics Data System (ADS)

    Gracheva, Irina E.; Olchowik, Grazyna; Gareev, Kamil G.; Moshnikov, Vyatcheslav A.; Kuznetsov, Vladimir V.; Olchowik, Jan M.

    2013-05-01

    This paper is concerned with the study of magnetic nanocomposites containing silicon, iron, nickel, and cobalt oxides. These materials were produced in the form of thin films based on Fe-Si-O, Ni-Co-Si-O and Fe-Ni-Co-Si-O systems and powders based on Fe-Si-O, Ni-Si-O, Co-Si-O and Fe-Ni-Co-Si-O systems using sol-gel technology, through centrifugation, and deposition of ammonia solution. The morphology and magnetic properties of materials in the form of thin films were studied by using the atomic force microscopy. The phase composition, specific surface area and magnetic properties of materials in the form of powders were studied by using the X-ray phase analysis, thermal desorption, vibrational magnetometry and immittance measurements. The dependencies of the main parameters were derived for the magnetic materials from their structure and manufacturing conditions. Ways to optimise the technological processes were proposed, aimed at reducing the size of the magnetic particles in an amorphous lattice.

  14. Demonstration of Synaptic Behaviors and Resistive Switching Characterizations by Proton Exchange Reactions in Silicon Oxide

    PubMed Central

    Chang, Yao-Feng; Fowler, Burt; Chen, Ying-Chen; Zhou, Fei; Pan, Chih-Hung; Chang, Ting-Chang; Lee, Jack C.

    2016-01-01

    We realize a device with biological synaptic behaviors by integrating silicon oxide (SiOx) resistive switching memory with Si diodes. Minimal synaptic power consumption due to sneak-path current is achieved and the capability for spike-induced synaptic behaviors is demonstrated, representing critical milestones for the use of SiO2–based materials in future neuromorphic computing applications. Biological synaptic behaviors such as long-term potentiation (LTP), long-term depression (LTD) and spike-timing dependent plasticity (STDP) are demonstrated systematically using a comprehensive analysis of spike-induced waveforms, and represent interesting potential applications for SiOx-based resistive switching materials. The resistive switching SET transition is modeled as hydrogen (proton) release from (SiH)2 to generate the hydrogen bridge defect, and the RESET transition is modeled as an electrochemical reaction (proton capture) that re-forms (SiH)2. The experimental results suggest a simple, robust approach to realize programmable neuromorphic chips compatible with large-scale CMOS manufacturing technology. PMID:26880381

  15. Demonstration of Synaptic Behaviors and Resistive Switching Characterizations by Proton Exchange Reactions in Silicon Oxide.

    PubMed

    Chang, Yao-Feng; Fowler, Burt; Chen, Ying-Chen; Zhou, Fei; Pan, Chih-Hung; Chang, Ting-Chang; Lee, Jack C

    2016-01-01

    We realize a device with biological synaptic behaviors by integrating silicon oxide (SiO(x)) resistive switching memory with Si diodes. Minimal synaptic power consumption due to sneak-path current is achieved and the capability for spike-induced synaptic behaviors is demonstrated, representing critical milestones for the use of SiO2-based materials in future neuromorphic computing applications. Biological synaptic behaviors such as long-term potentiation (LTP), long-term depression (LTD) and spike-timing dependent plasticity (STDP) are demonstrated systematically using a comprehensive analysis of spike-induced waveforms, and represent interesting potential applications for SiO(x)-based resistive switching materials. The resistive switching SET transition is modeled as hydrogen (proton) release from (SiH)2 to generate the hydrogen bridge defect, and the RESET transition is modeled as an electrochemical reaction (proton capture) that re-forms (SiH)2. The experimental results suggest a simple, robust approach to realize programmable neuromorphic chips compatible with large-scale CMOS manufacturing technology. PMID:26880381

  16. Demonstration of Synaptic Behaviors and Resistive Switching Characterizations by Proton Exchange Reactions in Silicon Oxide

    NASA Astrophysics Data System (ADS)

    Chang, Yao-Feng; Fowler, Burt; Chen, Ying-Chen; Zhou, Fei; Pan, Chih-Hung; Chang, Ting-Chang; Lee, Jack C.

    2016-02-01

    We realize a device with biological synaptic behaviors by integrating silicon oxide (SiOx) resistive switching memory with Si diodes. Minimal synaptic power consumption due to sneak-path current is achieved and the capability for spike-induced synaptic behaviors is demonstrated, representing critical milestones for the use of SiO2-based materials in future neuromorphic computing applications. Biological synaptic behaviors such as long-term potentiation (LTP), long-term depression (LTD) and spike-timing dependent plasticity (STDP) are demonstrated systematically using a comprehensive analysis of spike-induced waveforms, and represent interesting potential applications for SiOx-based resistive switching materials. The resistive switching SET transition is modeled as hydrogen (proton) release from (SiH)2 to generate the hydrogen bridge defect, and the RESET transition is modeled as an electrochemical reaction (proton capture) that re-forms (SiH)2. The experimental results suggest a simple, robust approach to realize programmable neuromorphic chips compatible with large-scale CMOS manufacturing technology.

  17. Aspects of the magmatic geochemistry of bismuth

    USGS Publications Warehouse

    Greenland, L.P.; Gottfried, D.; Campbell, E.Y.

    1973-01-01

    Bismuth has been determined in 74 rocks from a differentiated tholeiitic dolerite, two calc-alkaline batholith suites and in 66 mineral separates from one of the batholiths. Average bismuth contents, weighted for rock type, of the Great Lake (Tasmania) dolerite, the Southern California batholith and the Idaho batholith are, 32, 50 and 70 ppb respectively. All three bodies demonstrate an enrichment of bismuth in residual magmas with magmatic differentiation. Bismuth is greatly enriched (relative to the host rock) in the calcium-rich accessory minerals, apatite and sphene, but other mineral analyses show that a Bi-Ca association is of little significance to the magmatic geochemistry of bismuth. Most of the bismuth, in the Southern California batholith at least, occurs in a trace mineral phase (possibly sulfides) present as inclusions in the rock-forming minerals. ?? 1973.

  18. SEPARATION OF PLUTONIUM HYDROXIDE FROM BISMUTH HYDROXIDE

    DOEpatents

    Watt, G.W.

    1958-08-19

    An tmproved method is described for separating plutonium hydroxide from bismuth hydroxide. The end product of the bismuth phosphate processes for the separation amd concentration of plutonium is a inixture of bismuth hydroxide amd plutonium hydroxide. It has been found that these compounds can be advantageously separated by treatment with a reducing agent having a potential sufficient to reduce bismuth hydroxide to metalltc bisinuth but not sufficient to reduce the plutonium present. The resulting mixture of metallic bismuth and plutonium hydroxide can then be separated by treatment with a material which will dissolve plutonium hydroxide but not metallic bismuth. Sodiunn stannite is mentioned as a preferred reducing agent, and dilute nitric acid may be used as the separatory solvent.

  19. Excitation mechanism and thermal emission quenching of Tb ions in silicon rich silicon oxide thin films grown by plasma-enhanced chemical vapour deposition—Do we need silicon nanoclusters?

    SciTech Connect

    Podhorodecki, A. Golacki, L. W.; Zatryb, G.; Misiewicz, J.; Wang, J.; Jadwisienczak, W.; Fedus, K.

    2014-04-14

    In this work, we will discuss the excitation and emission properties of Tb ions in a Silicon Rich Silicon Oxide (SRSO) matrix obtained at different technological conditions. By means of electron cyclotron resonance plasma-enhanced chemical vapour deposition, undoped and doped SRSO films have been obtained with different Si content (33, 35, 39, 50 at. %) and were annealed at different temperatures (600, 900, 1100 °C). The samples were characterized optically and structurally using photoluminescence (PL), PL excitation, time resolved PL, absorption, cathodoluminescence, temperature dependent PL, Rutherford backscattering spectrometry, Fourier transform infrared spectroscopy and positron annihilation lifetime spectroscopy. Based on the obtained results, we discuss how the matrix modifications influence excitation and emission properties of Tb ions.

  20. BISMUTH PHOSPHATE CARRIER PROCESS FOR Pu RECOVERY

    DOEpatents

    Finzel, T.G.

    1959-02-01

    An improvement in the bismuth phosphate carrier precipitation process for recovering plutonium is described. It has been found that a more granular and more easily filterable carrier precipitiite is formed if the addition of the bismuth and phosphate ions is effected by first adding 9/10 of the bismuth ions necessary, then slowly adding all of the source of the phosphate ions to be incorporated in the precipitate, while digesting at 75 C and afterwards incorporating the remainder of the total bismuth ions necessary

  1. Improvement of filling bismuth for x-ray absorption gratings through the enhancement of wettability

    NASA Astrophysics Data System (ADS)

    Lei, Yaohu; Liu, Xin; Li, Ji; Guo, Jinchuan; Niu, Hanben

    2016-06-01

    Filling materials with high x-ray linear absorption coefficients in high aspect-ratio (HAR) structures is a key process for the fabrication of absorption gratings used in x-ray differential phase-contrast imaging. Bismuth has been chosen as an effective filling material in micro-casting technology, because of its low cost both in price and facility use. However, repellence on structure surfaces against molten bismuth leads to an obstacle in terms of completely filling bismuth into the small-aperture and HAR microstructure formed by photo-assisted electrochemical etching in 5 inch silicon wafers. We propose and implement a novel method of surface modification to completely fill bismuth into these structures with periods of 3 μm and 42 μm, respectively, and as deep as 150 μm. The modified surface with a Bi2O3 layer covering the structure surface, including the side walls, induces an enhanced bismuth filling ratio. The superiority of the method is demonstrated by micrographs which show filled microstructures compared to the previously used method, where only a layer of 100 nm SiO2 was covered. Furthermore, we have observed that the improved micro-casting makes the absorption gratings clean surfaces, and no post treatment is needed.

  2. Contact doping of silicon wafers and nanostructures with phosphine oxide monolayers.

    PubMed

    Hazut, Ori; Agarwala, Arunava; Amit, Iddo; Subramani, Thangavel; Zaidiner, Seva; Rosenwaks, Yossi; Yerushalmi, Roie

    2012-11-27

    Contact doping method for the controlled surface doping of silicon wafers and nanometer scale structures is presented. The method, monolayer contact doping (MLCD), utilizes the formation of a dopant-containing monolayer on a donor substrate that is brought to contact and annealed with the interface or structure intended for doping. A unique feature of the MLCD method is that the monolayer used for doping is formed on a separate substrate (termed donor substrate), which is distinct from the interface intended for doping (termed acceptor substrate). The doping process is controlled by anneal conditions, details of the interface, and molecular precursor used for the formation of the dopant-containing monolayer. The MLCD process does not involve formation and removal of SiO(2) capping layer, allowing utilization of surface chemistry details for tuning and simplifying the doping process. Surface contact doping of intrinsic Si wafers (i-Si) and intrinsic silicon nanowires (i-SiNWs) is demonstrated and characterized. Nanowire devices were formed using the i-SiNW channel and contact doped using the MLCD process, yielding highly doped SiNWs. Kelvin probe force microscopy (KPFM) was used to measure the longitudinal dopant distribution of the SiNWs and demonstrated highly uniform distribution in comparison with in situ doped wires. The MLCD process was studied for i-Si substrates with native oxide and H-terminated surface for three types of phosphorus-containing molecules. Sheet resistance measurements reveal the dependency of the doping process on the details of the surface chemistry used and relation to the different chemical environments of the P═O group. Characterization of the thermal decomposition of several monolayer types formed on SiO(2) nanoparticles (NPs) using TGA and XPS provides insight regarding the role of phosphorus surface chemistry at the SiO(2) interface in the overall MLCD process. The new MLCD process presented here for controlled surface doping

  3. Transport properties of silicon complementary-metal-oxide semiconductor quantum well field-effect transistors

    NASA Astrophysics Data System (ADS)

    Naquin, Clint Alan

    Introducing explicit quantum transport into silicon (Si) transistors in a manner compatible with industrial fabrication has proven challenging, yet has the potential to transform the performance horizons of large scale integrated Si devices and circuits. Explicit quantum transport as evidenced by negative differential transconductances (NDTCs) has been observed in a set of quantum well (QW) n-channel metal-oxide-semiconductor (NMOS) transistors fabricated using industrial silicon complementary MOS processing. The QW potential was formed via lateral ion implantation doping on a commercial 45 nm technology node process line, and measurements of the transfer characteristics show NDTCs up to room temperature. Detailed gate length and temperature dependence characteristics of the NDTCs in these devices have been measured. Gate length dependence of NDTCs shows a correlation of the interface channel length with the number of NDTCs formed as well as with the gate voltage (VG) spacing between NDTCs. The VG spacing between multiple NDTCs suggests a quasi-parabolic QW potential profile. The temperature dependence is consistent with partial freeze-out of carrier concentration against a degenerately doped background. A folding amplifier frequency multiplier circuit using a single QW NMOS transistor to generate a folded current-voltage transfer function via a NDTC was demonstrated. Time domain data shows frequency doubling in the kHz range at room temperature, and Fourier analysis confirms that the output is dominated by the second harmonic of the input. De-embedding the circuit response characteristics from parasitic cable and contact impedances suggests that in the absence of parasitics the doubling bandwidth could be as high as 10 GHz in a monolithic integrated circuit, limited by the transresistance magnitude of the QW NMOS. This is the first example of a QW device fabricated by mainstream Si CMOS technology being used in a circuit application and establishes the feasibility

  4. Structure of unsupported bismuth nanoparticles

    NASA Astrophysics Data System (ADS)

    Wurl, A.; Hyslop, M.; Brown, S. A.; Hall, B. D.; Monot, R.

    We present new results of electron diffraction experiments on unsupported nanometer-sized bismuth clusters. The high intensity cluster beam, necessary for electron diffraction, is provided by an inert-gas aggregation source. The cluster beam contains particles with average cluster sizes between 4.5 and 10 nm. When using Helium as a carrier gas we are able to observe a transition from crystalline clusters to a new structure, which we identify with that of amorphous or liquid clusters.

  5. Synthesis and performance of bismuth trioxide nanoparticles for high energy gas generator use.

    PubMed

    Martirosyan, K S; Wang, L; Vicent, A; Luss, D

    2009-10-01

    Our experiments showed that the combustion of an Al-Bi2O3 nanoparticle mixture generated the highest pressure pulse among common nanothermite reactions and can potentially be used as a nanoenergetic gas generator. The combustion front propagation velocity and rate of energy release increased by up to three orders of magnitude when the particle size was reduced to a nanosize range for both the aluminum and the oxidizer. We developed a novel one-step (metal nitrate-glycine) combustion synthesis of nanostructured amorphous-like and highly crystalline bismuth trioxide nanoparticles. The combustion synthesis was conducted using a solution of molten bismuth nitrate as an oxidizer and glycine as a fuel. The glycine was completely combusted during the thermal decomposition of the bismuth nitrate pentahydrate and generated a temperature front that propagated through the sample. Increasing the fuel concentration increased the maximum combustion temperature from 280 to 1200 degrees C and the Bi2O3 particle size from 20 to 100 nm. The oxidizer/fuel ratio had a strong impact on the bismuth trioxide particle crystallinity. At low temperature (280 degrees C), amorphous-like bismuth trioxide nanoparticles formed, while at T > or =370 degrees C the structures were crystalline. A peak pressure of approximately 12 MPa and a thermal front propagating velocity of approximately 2500 m s(-1) were achieved during the combustion of an Al-Bi2O3 mixture containing 80 wt% of the synthesized Bi2O3 crystalline nanoparticles (size: 40-50 nm).

  6. Synthesis and performance of bismuth trioxide nanoparticles for high energy gas generator use

    NASA Astrophysics Data System (ADS)

    Martirosyan, K. S.; Wang, L.; Vicent, A.; Luss, D.

    2009-10-01

    Our experiments showed that the combustion of an Al-Bi2O3 nanoparticle mixture generated the highest pressure pulse among common nanothermite reactions and can potentially be used as a nanoenergetic gas generator. The combustion front propagation velocity and rate of energy release increased by up to three orders of magnitude when the particle size was reduced to a nanosize range for both the aluminum and the oxidizer. We developed a novel one-step (metal nitrate-glycine) combustion synthesis of nanostructured amorphous-like and highly crystalline bismuth trioxide nanoparticles. The combustion synthesis was conducted using a solution of molten bismuth nitrate as an oxidizer and glycine as a fuel. The glycine was completely combusted during the thermal decomposition of the bismuth nitrate pentahydrate and generated a temperature front that propagated through the sample. Increasing the fuel concentration increased the maximum combustion temperature from 280 to 1200 °C and the Bi2O3 particle size from 20 to 100 nm. The oxidizer/fuel ratio had a strong impact on the bismuth trioxide particle crystallinity. At low temperature (280 °C), amorphous-like bismuth trioxide nanoparticles formed, while at T>=370 °C the structures were crystalline. A peak pressure of ~12 MPa and a thermal front propagating velocity of ~2500 m s-1 were achieved during the combustion of an Al-Bi2O3 mixture containing 80 wt% of the synthesized Bi2O3 crystalline nanoparticles (size: 40-50 nm).

  7. Current, charge, and capacitance during scanning probe oxidation of silicon. I. Maximum charge density and lateral diffusion

    NASA Astrophysics Data System (ADS)

    Dagata, J. A.; Perez-Murano, F.; Martin, C.; Kuramochi, H.; Yokoyama, H.

    2004-08-01

    A comprehensive analysis of the electrical current passing through the tip-substrate junction during oxidation of silicon by scanning probe microscopy (SPM) is presented. This analysis of experimental results under dc-bias conditions resolves the role of electronic and ionic contributions, especially for the initial stages of the reaction, determines the effective contact area of the tip-substrate junction, and unifies the roles of space charge and meniscus formation. In Part I of this work, we demonstrate that SPM oxidation is governed by a maximum charge density generated by electronic species within the junction at the onset of the oxidation process. Excess charge is channeled into lateral diffusion, keeping the charge density within the reaction zone constant and reducing the aspect ratio of the resulting oxide features. A uniform charge density implies that SPM oxides contain a fixed defect concentration, in accordance with the space-charge model. The effective (electrical) thickness of SPM oxides determined by these defects is investigated by Fowler-Nordheim analysis. We conclude that most of the electrical current involved in high voltage SPM oxidation of Si does not actually induce surface oxide growth, and that lateral diffusion and small aspect ratios are unavoidable aspects of contact-mode conditions.

  8. Photoreductive generation of amorphous bismuth nanoparticles using polysaccharides--bismuth-cellulose nanocomposites.

    PubMed

    Breitwieser, Doris; Kriechbaum, Margit; Ehmann, Heike M A; Monkowius, Uwe; Coseri, Sergiu; Sacarescu, Liviu; Spirk, Stefan

    2015-02-13

    A simple and highly reproducible synthesis of amorphous bismuth nanoparticles incorporated into a polysaccharide matrix using a photoreduction process is presented. As precursor for the generation of the Bi nanoparticles, organosoluble triphenylbismuth is used. The precursor is dissolved in toluene and mixed with a hydrophobic organosoluble polysaccharide, namely trimethylsilyl cellulose (TMSC) with high DSSi. The solution is subjected to UV exposure, which induces the homolytic cleavage of the bismuth-carbon bond in BiPh3 resulting in the formation of Bi(0) and phenyl radicals. The aggregation of the Bi atoms can be controlled in the TMSC matrix and yields nanoparticles of around 20 nm size as proven by TEM. The phenyl radicals undergo recombination to form small organic molecules like benzene and biphenyl, which can be removed from the nanocomposite after lyophilization and exposure to high vacuum. Finally, the TMSC matrix is converted to cellulose after exposure to HCl vapors, which remove the trimethylsilyl groups from the TMSC derivative. Although TMSC is converted to cellulose, the formed TMS-OH is not leaving the nanocomposite but reacts instead with surface oxide layer of the Bi nanoparticles to form silylated Bi nanoparticles as proven by TEM/EDX.

  9. Structural and optical properties of silicon rich oxide films in graded-stoichiometric multilayers for optoelectronic devices

    NASA Astrophysics Data System (ADS)

    Palacios-Huerta, L.; Cabañas-Tay, S. A.; Cardona-Castro, M. A.; Aceves-Mijares, M.; Domínguez-Horna, C.; Morales-Sánchez, A.

    2016-07-01

    Silicon nanocrystals (Si-ncs) are excellent candidates for the development of optoelectronic devices. Nevertheless, different strategies are still necessary to enhance their photo and electroluminescent properties by controlling their structural and compositional properties. In this work, the effect of the stoichiometry and structure on the optical properties of silicon rich oxide (SRO) films in a multilayered (ML) structure is studied. SRO MLs with silicon excess gradually increased towards the top and bottom and towards the center of the ML produced through the variation of the stoichiometry in each SRO layer were fabricated and confirmed by X-ray photoelectron spectroscopy. Si-ncs with three main sizes were observed by a transmission electron microscope, in agreement with the stoichiometric profile of each SRO layer. The presence of the three sized Si-ncs and some oxygen related defects enhances intense violet/blue and red photoluminescence (PL) bands. The SRO MLs were super-enriched with additional excess silicon by Si+ implantation, which enhanced the PL intensity. Oxygen-related defects and small Si-ncs (<2 nm) are mostly generated during ion implantation enhancing the violet/blue band to become comparable to the red band. The structural, compositional, and luminescent characteristics of the multilayers are the result of the contribution of the individual characteristics of each layer.

  10. Evaluation of Seebeck coefficients in n- and p-type silicon nanowires fabricated by complementary metal-oxide-semiconductor technology.

    PubMed

    Hyun, Younghoon; Park, Youngsam; Choi, Wonchul; Kim, Jaehyeon; Zyung, Taehyoung; Jang, Moongyu

    2012-10-12

    Silicon-based thermoelectric nanowires were fabricated by using complementary metal-oxide-semiconductor (CMOS) technology. 50 nm width n- and p-type silicon nanowires (SiNWs) were manufactured using a conventional photolithography method on 8 inch silicon wafer. For the evaluation of the Seebeck coefficients of the silicon nanowires, heater and temperature sensor embedded test patterns were fabricated. Moreover, for the elimination of electrical and thermal contact resistance issues, the SiNWs, heater and temperature sensors were fabricated monolithically using a CMOS process. For validation of the temperature measurement by an electrical method, scanning thermal microscopy analysis was carried out. The highest Seebeck coefficients were - 169.97 μV K(-1) and 152.82 μV K(-1) and the highest power factors were 2.77 mW m(-1) K(-2) and 0.65 mW m(-1) K(-2) for n- and p-type SiNWs, respectively, in the temperature range from 200 to 300 K. The larger power factor value for n-type SiNW was due to the higher electrical conductivity. The total Seebeck coefficient and total power factor for the n- and p-leg unit device were 157.66 μV K(-1) and 9.30 mW m(-1) K(-2) at 300 K, respectively.

  11. Electronic interface properties of silicon substrates after ozone based wet-chemical oxidation studied by SPV measurements

    NASA Astrophysics Data System (ADS)

    Angermann, Heike; Wolke, Klaus; Gottschalk, Christiane; Moldovan, Ana; Roczen, Maurizio; Fittkau, Jens; Zimmer, Martin; Rentsch, Jochen

    2012-08-01

    The preparation of ultra-thin oxide layers on mono-crystalline silicon substrate surfaces with ozone dissolved in ultra pure water at ambient temperature was investigated as a low cost alternative to current wet-chemical cleaning and passivation processes in solar cell manufacturing. Surface photovoltage technique was applied as fast, nondestructive, and surface sensitive method, to provide detailed information about the influence of oxidation rate and substrate surface morphology on electronic properties of the oxidised silicon interfaces and subsequently prepared hydrogen terminated surfaces. Sequences of wet-chemical oxidation in ozone containing ultra pure water and subsequent oxide removal in diluted hydrofluoric acid solution could be utilised to prepare hydrophobic substrates, which are predominantly required as starting point for layer deposition and contact formation. On so prepared hydrogen-terminated substrates values of interface state densities Dit,min ≈ 5 × 1011 eV-1 cm-2 could be achieved, comparable to values obtained on the same substrates by the standard RCA process followed by HF dip.

  12. One-Step Formation of Silicon-Graphene Composites from Silicon Sludge Waste and Graphene Oxide via Aerosol Process for Lithium Ion Batteries.

    PubMed

    Kim, Sun Kyung; Kim, Hyekyoung; Chang, Hankwon; Cho, Bong-Gyoo; Huang, Jiaxing; Yoo, Hyundong; Kim, Hansu; Jang, Hee Dong

    2016-01-01

    Over 40% of high-purity silicon (Si) is consumed as sludge waste consisting of Si, silicon carbide (SiC) particles and metal impurities from the fragments of cutting wire mixed in ethylene glycol based cutting fluid during Si wafer slicing in semiconductor fabrication. Recovery of Si from the waste Si sludge has been a great concern because Si particles are promising high-capacity anode materials for Li ion batteries. In this study, we report a novel one-step aerosol process that not only extracts Si particles but also generates Si-graphene (GR) composites from the colloidal mixture of waste Si sludge and graphene oxide (GO) at the same time by ultrasonic atomization-assisted spray pyrolysis. This process supports many advantages such as eco-friendly, low-energy, rapid, and simple method for forming Si-GR composite. The morphology of the as-formed Si-GR composites looked like a crumpled paper ball and the average size of the composites varied from 0.6 to 0.8 μm with variation of the process variables. The electrochemical performance was then conducted with the Si-GR composites for Lithium Ion Batteries (LIBs). The Si-GR composites exhibited very high performance as Li ion battery anodes in terms of capacity, cycling stability, and Coulombic efficiency. PMID:27646853

  13. One-Step Formation of Silicon-Graphene Composites from Silicon Sludge Waste and Graphene Oxide via Aerosol Process for Lithium Ion Batteries

    PubMed Central

    Kim, Sun Kyung; Kim, Hyekyoung; Chang, Hankwon; Cho, Bong-Gyoo; Huang, Jiaxing; Yoo, Hyundong; Kim, Hansu; Jang, Hee Dong

    2016-01-01

    Over 40% of high-purity silicon (Si) is consumed as sludge waste consisting of Si, silicon carbide (SiC) particles and metal impurities from the fragments of cutting wire mixed in ethylene glycol based cutting fluid during Si wafer slicing in semiconductor fabrication. Recovery of Si from the waste Si sludge has been a great concern because Si particles are promising high-capacity anode materials for Li ion batteries. In this study, we report a novel one-step aerosol process that not only extracts Si particles but also generates Si-graphene (GR) composites from the colloidal mixture of waste Si sludge and graphene oxide (GO) at the same time by ultrasonic atomization-assisted spray pyrolysis. This process supports many advantages such as eco-friendly, low-energy, rapid, and simple method for forming Si-GR composite. The morphology of the as-formed Si-GR composites looked like a crumpled paper ball and the average size of the composites varied from 0.6 to 0.8 μm with variation of the process variables. The electrochemical performance was then conducted with the Si-GR composites for Lithium Ion Batteries (LIBs). The Si-GR composites exhibited very high performance as Li ion battery anodes in terms of capacity, cycling stability, and Coulombic efficiency. PMID:27646853

  14. One-Step Formation of Silicon-Graphene Composites from Silicon Sludge Waste and Graphene Oxide via Aerosol Process for Lithium Ion Batteries

    NASA Astrophysics Data System (ADS)

    Kim, Sun Kyung; Kim, Hyekyoung; Chang, Hankwon; Cho, Bong-Gyoo; Huang, Jiaxing; Yoo, Hyundong; Kim, Hansu; Jang, Hee Dong

    2016-09-01

    Over 40% of high-purity silicon (Si) is consumed as sludge waste consisting of Si, silicon carbide (SiC) particles and metal impurities from the fragments of cutting wire mixed in ethylene glycol based cutting fluid during Si wafer slicing in semiconductor fabrication. Recovery of Si from the waste Si sludge has been a great concern because Si particles are promising high-capacity anode materials for Li ion batteries. In this study, we report a novel one-step aerosol process that not only extracts Si particles but also generates Si-graphene (GR) composites from the colloidal mixture of waste Si sludge and graphene oxide (GO) at the same time by ultrasonic atomization-assisted spray pyrolysis. This process supports many advantages such as eco-friendly, low-energy, rapid, and simple method for forming Si-GR composite. The morphology of the as-formed Si-GR composites looked like a crumpled paper ball and the average size of the composites varied from 0.6 to 0.8 μm with variation of the process variables. The electrochemical performance was then conducted with the Si-GR composites for Lithium Ion Batteries (LIBs). The Si-GR composites exhibited very high performance as Li ion battery anodes in terms of capacity, cycling stability, and Coulombic efficiency.

  15. One-Step Formation of Silicon-Graphene Composites from Silicon Sludge Waste and Graphene Oxide via Aerosol Process for Lithium Ion Batteries.

    PubMed

    Kim, Sun Kyung; Kim, Hyekyoung; Chang, Hankwon; Cho, Bong-Gyoo; Huang, Jiaxing; Yoo, Hyundong; Kim, Hansu; Jang, Hee Dong

    2016-09-20

    Over 40% of high-purity silicon (Si) is consumed as sludge waste consisting of Si, silicon carbide (SiC) particles and metal impurities from the fragments of cutting wire mixed in ethylene glycol based cutting fluid during Si wafer slicing in semiconductor fabrication. Recovery of Si from the waste Si sludge has been a great concern because Si particles are promising high-capacity anode materials for Li ion batteries. In this study, we report a novel one-step aerosol process that not only extracts Si particles but also generates Si-graphene (GR) composites from the colloidal mixture of waste Si sludge and graphene oxide (GO) at the same time by ultrasonic atomization-assisted spray pyrolysis. This process supports many advantages such as eco-friendly, low-energy, rapid, and simple method for forming Si-GR composite. The morphology of the as-formed Si-GR composites looked like a crumpled paper ball and the average size of the composites varied from 0.6 to 0.8 μm with variation of the process variables. The electrochemical performance was then conducted with the Si-GR composites for Lithium Ion Batteries (LIBs). The Si-GR composites exhibited very high performance as Li ion battery anodes in terms of capacity, cycling stability, and Coulombic efficiency.

  16. In vitro cytotoxicity of surface modified bismuth nanoparticles.

    PubMed

    Luo, Yang; Wang, Chaoming; Qiao, Yong; Hossain, Mainul; Ma, Liyuan; Su, Ming

    2012-10-01

    This paper describes in vitro cytotoxicity of bismuth nanoparticles revealed by three complementary assays (MTT, G6PD, and calcein AM/EthD-1). The results show that bismuth nanoparticles are more toxic than most previously reported bismuth compounds. Concentration dependent cytotoxicities have been observed for bismuth nanoparticles and surface modified bismuth nanoparticles. The bismuth nanoparticles are non-toxic at concentration of 0.5 nM. Nanoparticles at high concentration (50 nM) kill 45, 52, 41, 34 % HeLa cells for bare nanoparticles, amine terminated bismuth nanoparticles, silica coated bismuth nanoparticles, and polyethylene glycol (PEG) modified bismuth nanoparticles, respectively; which indicates cytotoxicity in terms of cell viability is in the descending order of amine terminated bismuth nanoparticles, bare bismuth nanoparticles, silica coated bismuth nanoparticles, and PEG modified bismuth nanoparticles. HeLa cells are more susceptible to toxicity from bismuth nanoparticles than MG-63 cells. The simultaneous use of three toxicity assays provides information on how nanoparticles interact with cells. Silica coated bismuth nanoparticles can damage cellular membrane yet keep mitochondria less influenced; while amine terminated bismuth nanoparticles can affect the metabolic functions of cells. The findings have important implications for caution of nanoparticle exposure and evaluating toxicity of bismuth nanoparticles.

  17. Bismuth ions are metabolized into autometallographic traceable bismuth-sulphur quantum dots.

    PubMed

    Stoltenberg, M; Juhl, S; Danscher, G

    2007-01-01

    Bismuth - sulphur quantum dots can be silver enhanced by autometallography (AMG). In the present study, autometallographic silver enhanced bismuth-sulphur nanocrystals were isolated from unfixed cryo-sections of kidneys and livers of rats exposed to bismuth (Bi207) subnitrate. After being subjected to AMG all the organic material was removed by sonication and enzymatic digestion and the silver enhanced Bi-S quantum dots spun down by an ultracentrifuge and analyzed by scintillation. The analysis showed that the autometallographic technique traces approximately 94% of the total bismuth. This implies that the injected bismuth is ultimately captured in bismuth-sulphur quantum dots, i.e., that Bi-S nanocrystals are the end product of bismuth metabolism.

  18. Electronic states at the interface between indium tin oxide and silicon

    SciTech Connect

    Malmbekk, H.; Vines, L.; Monakhov, E. V.; Svensson, B. G.

    2011-10-01

    Electronic properties and thermal stability of interfacial states between indium tin oxide (ITO) and monocrystalline silicon (Si) have been investigated. ITO films with thicknesses of about 300 nm were deposited by dc magnetron sputtering on n- and p-type (100) Si at room temperature. The samples were then annealed for 30 min at different temperatures in the range 100-600 deg. C, and the ITO-Si junction was found to exhibit rectifying behavior. Current-voltage (IV), capacitance-voltage (CV), and deep-level transient spectroscopy (DLTS) measurements have been used to electrically characterize the ITO-Si interface. DLTS measurements on p-type Si samples reveal a dominant hole trap at around 0.37 eV above the valence band edge. In the n-type samples, a broad band of electron traps occur in the range 0.1-0.2 eV below the conduction band edge. These electron traps display wide DLTS peaks, indicating a band of electronic energy levels rather than well-defined states originating from isolated point defects. All the traps in both the p- and n-type samples are found to be located near the ITO-Si interface. Investigations of the thermal stability of the observed electronic states show that the dominant hole trap anneal out after 30 min at 250 deg. C, while the dominant electron traps can be stable up to 500 deg. C. IV and DLTS measurements demonstrate a clear correlation between the annealing of the dominant electronic states and increase in the junction rectification.

  19. Comparative toxicity of silicon dioxide, silver and iron oxide nanoparticles after repeated oral administration to rats.

    PubMed

    Yun, Jun-Won; Kim, Seung-Hyun; You, Ji-Ran; Kim, Woo Ho; Jang, Ja-June; Min, Seung-Kee; Kim, Hee Chan; Chung, Doo Hyun; Jeong, Jayoung; Kang, Byeong-Cheol; Che, Jeong-Hwan

    2015-06-01

    Although silicon dioxide (SiO2), silver (Ag) and iron oxide (Fe2O3) nanoparticles are widely used in diverse applications from food to biomedicine, in vivo toxicities of these nanoparticles exposed via the oral route remain highly controversial. To examine the systemic toxicity of these nanoparticles, well-dispersed nanoparticles were orally administered to Sprague-Dawley rats daily over a 13-week period. Based on the results of an acute toxicity and a 14-day repeated toxicity study, 975.9, 1030.5 and 1000 mg kg(-1) were selected as the highest dose of the SiO2 , Ag and Fe2O3 nanoparticles, respectively, for the 13-week repeated oral toxicity study. The SiO2 and Fe2O3 nanoparticles did not induce dose-related changes in a number of parameters associated with the systemic toxicity up to 975.9 and 1000 mg kg(-1) , respectively, whereas the Ag nanoparticles resulted in increases in serum alkaline phosphatase and calcium as well as lymphocyte infiltration in liver and kidney, raising the possibility of liver and kidney toxicity induced by the Ag nanoparticles. Compared with the SiO2 and Fe2O3 nanoparticles showing no systemic distribution in all tissues tested, the Ag concentration in sampled blood and organs in the Ag nanoparticle-treated group significantly increased with a positive and/or dose-related trend, meaning that the systemic toxicity of the Ag nanoparticles, including liver and kidney toxicity, might be explained by extensive systemic distribution of Ag originating from the Ag nanoparticles. Our current results suggest that further study is required to identify that Ag detected outside the gastrointestinal tract were indeed a nanoparticle form or ionized form.

  20. Structural and photoluminescence studies on catalytic growth of silicon/zinc oxide heterostructure nanowires

    PubMed Central

    2013-01-01

    Silicon/zinc oxide (Si/ZnO) core-shell nanowires (NWs) were prepared on a p-type Si(111) substrate using a two-step growth process. First, indium seed-coated Si NWs (In/Si NWs) were synthesized using a plasma-assisted hot-wire chemical vapor deposition technique. This was then followed by the growth of a ZnO nanostructure shell layer using a vapor transport and condensation method. By varying the ZnO growth time from 0.5 to 2 h, different morphologies of ZnO nanostructures, such as ZnO nanoparticles, ZnO shell layer, and ZnO nanorods were grown on the In/Si NWs. The In seeds were believed to act as centers to attract the ZnO molecule vapors, further inducing the lateral growth of ZnO nanorods from the Si/ZnO core-shell NWs via a vapor-liquid-solid mechanism. The ZnO nanorods had a tendency to grow in the direction of [0001] as indicated by X-ray diffraction and high resolution transmission electron microscopy analyses. We showed that the Si/ZnO core-shell NWs exhibit a broad visible emission ranging from 400 to 750 nm due to the combination of emissions from oxygen vacancies in ZnO and In2O3 structures and nanocrystallite Si on the Si NWs. The hierarchical growth of straight ZnO nanorods on the core-shell NWs eventually reduced the defect (green) emission and enhanced the near band edge (ultraviolet) emission of the ZnO. PMID:23590803

  1. Effects of N{sub 2} addition on chemical dry etching of silicon oxide layers in F{sub 2}/N{sub 2}/Ar remote plasmas

    SciTech Connect

    Hwang, J.Y.; Kim, D.J.; Lee, N.-E.; Jang, Y.C.; Bae, G.H.

    2006-07-15

    In this study, chemical dry etching characteristics of silicon oxide layers were investigated in the F{sub 2}/N{sub 2}/Ar remote plasmas. A toroidal-type remote plasma source was used for the generation of remote plasmas. The effects of additive N{sub 2} gas on the etch rates of various silicon oxide layers deposited using different deposition techniques and precursors were investigated by varying the various process parameters, such as the F{sub 2} flow rate, the additive N{sub 2} flow rate, and the substrate temperature. The etch rates of the various silicon oxide layers at room temperature were initially increased and then decreased with the N{sub 2} flow increased, which indicates an existence of the maximum etch rates. Increase in the oxide etch rates under the decreased optical emission intensity of the F radicals with the N{sub 2} flow increased implies that the chemical etching reaction is in the chemical reaction-limited regime, where the etch rate is governed by the surface chemical reaction rather than the F radical density. The etch rates of the silicon oxide layers were also significantly increased with the substrate temperature increased. In the present experiments, the F{sub 2} gas flow, the additive N{sub 2} flow rate, and the substrate temperature were found to be the critical parameters in determining the etch rate of the silicon oxide layers.

  2. A photoemission study of the effectiveness of nickel, manganese, and cobalt based corrosion barriers for silicon photo-anodes during water oxidation

    NASA Astrophysics Data System (ADS)

    O'Connor, Robert; Bogan, Justin; McCoy, Anthony; Byrne, Conor; Hughes, Greg

    2016-05-01

    Silicon is an attractive material for solar water splitting applications due to its abundance and its capacity to absorb a large fraction of incident solar radiation. However, it has not received as much attention as other materials due to its tendency to oxidize very quickly in aqueous environments, particularly when it is employed as the anode where it drives the oxygen evolution reaction. In recent years, several works have appeared in the literature examining the suitability of thin transition metal oxide films grown on top of the silicon to act as a corrosion barrier. The film should be transparent to solar radiation, allow hole transport from the silicon surface to the electrolyte, and stop the diffusion of oxygen from the electrolyte back to the silicon. In this work, we compare Mn-oxide, Co-oxide, and Ni-oxide thin films grown using physical vapor deposition in order to evaluate which material offers the best combination of photocurrent and corrosion protection. In addition to the electrochemical data, we also present a detailed before-and-after study of the surface chemistry of the films using x-ray photoelectron spectroscopy. This approach allows for a comprehensive analysis of the mechanisms by which the corrosion barriers protect the underlying silicon, and how they degrade during the water oxidation reaction.

  3. Low resistance Ohmic contact to p-type crystalline silicon via nitrogen-doped copper oxide films

    NASA Astrophysics Data System (ADS)

    Zhang, Xinyu; Wan, Yimao; Bullock, James; Allen, Thomas; Cuevas, Andres

    2016-08-01

    This work explores the application of transparent nitrogen doped copper oxide (CuOx:N) films deposited by reactive sputtering to create hole-selective contacts for p-type crystalline silicon (c-Si) solar cells. It is found that CuOx:N sputtered directly onto crystalline silicon is able to form an Ohmic contact. X-ray photoelectron spectroscopy and Raman spectroscopy measurements are used to characterise the structural and physical properties of the CuOx:N films. Both the oxygen flow rate and the substrate temperature during deposition have a significant impact on the film composition, as well as on the resulting contact resistivity. After optimization, a low contact resistivity of ˜10 mΩ cm2 has been established. This result offers significant advantages over conventional contact structures in terms of carrier transport and device fabrication.

  4. Sponge-like Si-SiO{sub 2} nanocomposite—Morphology studies of spinodally decomposed silicon-rich oxide

    SciTech Connect

    Friedrich, D.; Schmidt, B.; Heinig, K. H.; Liedke, B.; Mücklich, A.; Hübner, R.; Wolf, D.; Kölling, S.; Mikolajick, T.

    2013-09-23

    Sponge-like Si nanostructures embedded in SiO{sub 2} were fabricated by spinodal decomposition of sputter-deposited silicon-rich oxide with a stoichiometry close to that of silicon monoxide. After thermal treatment a mean feature size of about 3 nm was found in the phase-separated structure. The structure of the Si-SiO{sub 2} nanocomposite was investigated by energy-filtered transmission electron microscopy (EFTEM), EFTEM tomography, and atom probe tomography, which revealed a percolated Si morphology. It was shown that the percolation of the Si network in 3D can also be proven on the basis of 2D EFTEM images by comparison with 3D kinetic Monte Carlo simulations.

  5. Silicon/hematite core/shell nanowire array decorated with gold nanoparticles for unbiased solar water oxidation.

    PubMed

    Wang, Xin; Peng, Kui-Qing; Hu, Ya; Zhang, Fu-Qiang; Hu, Bo; Li, Li; Wang, Meng; Meng, Xiang-Min; Lee, Shuit-Tong

    2014-01-01

    We report the facile fabrication of three-dimensional (3D) silicon/hematite core/shell nanowire arrays decorated with gold nanoparticles (AuNPs) and their potential application for sunlight-driven solar water splitting. The hematite and AuNPs respectively play crucial catalytic and plasmonic photosensitization roles, while silicon absorbs visible light and generates high photocurrent. Under simulated solar light illumination, solar water splitting with remarkable efficiency is achieved with no external bias applied. Such a nanocomposite photoanode design offers great promise for unassisted sunlight-driven water oxidation, and further stability and efficiency improvements to the device will lead to exciting prospects for practical solar water splitting and artificial photosynthesis.

  6. Facile synthesis of reduced graphene oxide-porous silicon composite as superior anode material for lithium-ion battery anodes

    NASA Astrophysics Data System (ADS)

    Jiao, Lian-Sheng; Liu, Jin-Yu; Li, Hong-Yan; Wu, Tong-Shun; Li, Fenghua; Wang, Hao-Yu; Niu, Li

    2016-05-01

    We report a new method for synthesizing reduced graphene oxide (rGO)-porous silicon composite for lithium-ion battery anodes. Rice husks were used as a as a raw material source for the synthesis of porous Si through magnesiothermic reduction process. The as-obtained composite exhibits good rate and cycling performance taking advantage of the porous structure of silicon inheriting from rice husks and the outstanding characteristic of graphene. A considerably high delithiation capacity of 907 mA h g-1 can be retained even at a rate of 16 A g-1. A discharge capacity of 830 mA h g-1 at a current density of 1 A g-1 was delivered after 200 cycles. This may contribute to the further advancement of Si-based composite anode design.

  7. Substitution effects on bismuth based multifunctional materials

    NASA Astrophysics Data System (ADS)

    Krezhov, Kiril; Kovachev, Stefan; Svab, Erzsebet

    Described are our targeted experiments to improve understanding of some key aspects of the mechanisms contributing to intrinsic effects such as the magnetoelectric coupling in oxides. The magnetoelectric materials have long been of interest because of useful combinations of electrical, magnetic, optical and catalytic properties. Particularly spectacular are the manganites(M=Mn) for which apart from the strong magnetoresistance (MR) effect another striking feature is the occurrence of charge and orbital ordering (CO-OO) effects connected with the specific orbital orientation and the spatial arrangement of the eg orbitals. The MR and CO-OO effects are a manifestation of the strong interplay between the orbital, charge, and spin degrees of freedom in these systems and in some cases gives rise to multiferroicity. In this regard, some of our research is on new ABO3, AB2O5 and double perovskites A2BB'O6 containing p elements with lone pair electrons such as Bi3+. Bismuth creates irregular oxygen coordination environment and to stabilize its valence state often requires the use of high pressure or specific soft chemistry. Studied are the effects of cationic substitution on the structural parameters of the perovskites (Bi1-yRy)1-xAxMnO3 (R = rare earth; A= Ca2+, Sr2+; x,y=0.5), BiFexMn2-xO5, La1-xBiXMn2O5 etc. Ab-initio density functional theory calculations were performed to study the structure, magnetic and optical properties of multiferroic BiFeO3, also modified with La3+ and Mn3+. Synthesized and characterized is a new bismuth oxide - multiferroic BiFe2O5-δ A number of studies continue to address this class of materials and related-type materials such as cobaltites, chromites and ferrites, much of the work being driven by the potential applications as electrode materials in solid oxide fuel cells, exhaust gas sensors, membranes for separation processes or as catalysts but lately new functionalities emerge and are in the focus for use in electronics and information

  8. 21 CFR 73.1162 - Bismuth oxychloride.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... COLOR ADDITIVES EXEMPT FROM CERTIFICATION Drugs § 73.1162 Bismuth oxychloride. (a) Identity. (1) The color additive bismuth oxychloride is a synthetically prepared white or nearly white amorphous or finely crystalline, odorless powder consisting principally of BiOCl. (2) Color additive mixtures for drug use...

  9. 21 CFR 73.1162 - Bismuth oxychloride.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... COLOR ADDITIVES EXEMPT FROM CERTIFICATION Drugs § 73.1162 Bismuth oxychloride. (a) Identity. (1) The color additive bismuth oxychloride is a synthetically prepared white or nearly white amorphous or finely crystalline, odorless powder consisting principally of BiOCl. (2) Color additive mixtures for drug use...

  10. 21 CFR 73.1162 - Bismuth oxychloride.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... COLOR ADDITIVES EXEMPT FROM CERTIFICATION Drugs § 73.1162 Bismuth oxychloride. (a) Identity. (1) The color additive bismuth oxychloride is a synthetically prepared white or nearly white amorphous or finely crystalline, odorless powder consisting principally of BiOCl. (2) Color additive mixtures for drug use...

  11. 21 CFR 73.1162 - Bismuth oxychloride.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... COLOR ADDITIVES EXEMPT FROM CERTIFICATION Drugs § 73.1162 Bismuth oxychloride. (a) Identity. (1) The color additive bismuth oxychloride is a synthetically prepared white or nearly white amorphous or finely crystalline, odorless powder consisting principally of BiOCl. (2) Color additive mixtures for drug use...

  12. 21 CFR 73.1162 - Bismuth oxychloride.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... COLOR ADDITIVES EXEMPT FROM CERTIFICATION Drugs § 73.1162 Bismuth oxychloride. (a) Identity. (1) The color additive bismuth oxychloride is a synthetically prepared white or nearly white amorphous or finely crystalline, odorless powder consisting principally of BiOCl. (2) Color additive mixtures for drug use...

  13. Effects of Low Temperature Anneal on the Interface Properties of Thermal Silicon Oxide for Silicon Surface Passivation.

    PubMed

    Balaji, Nagarajan; Park, Cheolmin; Chung, Sungyoun; Ju, Minkyu; Raja, Jayapal; Yi, Junsin

    2016-05-01

    High quality surface passivation has gained a significant importance in photovoltaic industry for reducing the surface recombination and hence fabricating low cost and high efficiency solar cells using thinner wafers. The formation of good-quality SiO2 films and SiO2/Si interfaces at low processing temperatures is a prerequisite for improving the conversion efficiency of industrial solar cells with better passivation. High-temperature annealing in inert ambient is promising to improve the SiO2/Si interface. However, annealing treatments could cause negative effects on SiO2/Si interfaces due to its chemical at high temperatures. Low temperature post oxidation annealing has been carried out to investigate the structural and interface properties of Si-SiO2 system. Quasi Steady State Photo Conductance measurements shows a promising effective carrier lifetime of 420 μs, surface recombination velocity of 22 cm/s and a low interface trap density (D(it)) of 4 x 10(11) states/cm2/eV after annealing. The fixed oxide charge density was reduced to 1 x 10(11)/cm2 due to the annealing at 500 degrees C. The FWHM and the Si-O peak wavenumber corresponding to the samples annealed at 500 degrees C reveals that the Si dangling bonds in the SiO2 films due to the oxygen defects was reduced by the low temperature post oxidation annealing. PMID:27483822

  14. Bismuth nickel passivation effective in FCCU

    SciTech Connect

    Heite, R.S. ); English, A.R. ); Smith, G.A. )

    1990-06-04

    Bismuth-based nickel passivation has been effective in Mapco Petroleum Inc.'s fluid catalytic cracking unit (FCCU) at its Memphis, Tenn., refinery for the past 2 years. Mapco switched to the bismuth passivator in 1988 after using antimony as a passivator since the early 1980s. Metals (nickel and vanadium) passivators help reduce the catalyst activity suppression that occurs from contamination of the catalyst with feed-born metals. With the switch to bismuth, a hazardous material has been eliminated. Antimony is on the U.S. Environmental protection Agency's lit of hazardous chemicals. The bismuth also reduced the deleterious effects of high nickel content in the feed to the FCCU, at a bismuth quantity equal to, or slightly greater than, the amount of antimony previously used. Trouble-free operation of the unit was maintained at a reduced passivation cost.

  15. Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Materials.

    PubMed

    Stefik, Morgan

    2016-07-01

    The fabrication of porous nanocomposites is key to the advancement of energy conversion and storage devices that interface with electrolytes. Bismuth vanadate, BiVO4 , is a promising oxide for solar water splitting where the controlled fabrication of BiVO4 layers within porous, conducting scaffolds has remained a challenge. Here, the atomic layer deposition of bismuth vanadates is reported from BiPh3 , vanadium(V) oxytriisopropoxide, and water. The resulting films have tunable stoichiometry and may be crystallized to form the photoactive scheelite structure of BiVO4 . A selective etching process was used with vanadium-rich depositions to enable the synthesis of phase-pure BiVO4 after spinodal decomposition. BiVO4 thin films were measured for photoelectrochemical performance under AM 1.5 illumination. The average photocurrents were 1.17 mA cm(-2) at 1.23 V versus the reversible hydrogen electrode using a hole-scavenging sulfite electrolyte. The capability to deposit conformal bismuth vanadates will enable a new generation of nanocomposite architectures for solar water splitting.

  16. Low power zinc-oxide based charge trapping memory with embedded silicon nanoparticles via poole-frenkel hole emission

    SciTech Connect

    El-Atab, Nazek; Nayfeh, Ammar; Ozcan, Ayse; Alkis, Sabri; Okyay, Ali K.

    2014-01-06

    A low power zinc-oxide (ZnO) charge trapping memory with embedded silicon (Si) nanoparticles is demonstrated. The charge trapping layer is formed by spin coating 2 nm silicon nanoparticles between Atomic Layer Deposited ZnO steps. The threshold voltage shift (ΔV{sub t}) vs. programming voltage is studied with and without the silicon nanoparticles. Applying −1 V for 5 s at the gate of the memory with nanoparticles results in a ΔV{sub t} of 3.4 V, and the memory window can be up to 8 V with an excellent retention characteristic (>10 yr). Without nanoparticles, at −1 V programming voltage, the ΔV{sub t} is negligible. In order to get ΔV{sub t} of 3.4 V without nanoparticles, programming voltage in excess of 10 V is required. The negative voltage on the gate programs the memory indicating that holes are being trapped in the charge trapping layer. In addition, at 1 V the electric field across the 3.6 nm tunnel oxide is calculated to be 0.36 MV/cm, which is too small for significant tunneling. Moreover, the ΔV{sub t} vs. electric field across the tunnel oxide shows square root dependence at low fields (E < 1 MV/cm) and a square dependence at higher fields (E > 2.7 MV/cm). This indicates that Poole-Frenkel Effect is the main mechanism for holes emission at low fields and Phonon Assisted Tunneling at higher fields.

  17. Surface Area, and Oxidation Effects on Nitridation Kinetics of Silicon Powder Compacts

    NASA Technical Reports Server (NTRS)

    Bhatt, R. T.; Palczer, A. R.

    1998-01-01

    Commercially available silicon powders were wet-attrition-milled from 2 to 48 hr to achieve surface areas (SA's) ranging from 1.3 to 70 sq m/g. The surface area effects on the nitridation kinetics of silicon powder compacts were determined at 1250 or 1350 C for 4 hr. In addition, the influence of nitridation environment, and preoxidation on nitridation kinetics of a silicon powder of high surface area (approximately equals 63 sq m/g) was investigated. As the surface area increased, so did the percentage nitridation after 4 hr in N2 at 1250 or 1350 C. Silicon powders of high surface area (greater than 40 sq m/g) can be nitrided to greater than 70% at 1250 C in 4 hr. The nitridation kinetics of the high-surface-area powder compacts were significantly delayed by preoxidation treatment. Conversely, the nitridation environment had no significant influence on the nitridation kinetics of the same powder. Impurities present in the starting powder, and those accumulated during attrition milling, appeared to react with the silica layer on the surface of silicon particles to form a molten silicate layer, which provided a path for rapid diffusion of nitrogen and enhanced the nitridation kinetics of high surface area silicon powder.

  18. Scanning capacitance microscopy and spectroscopy applied to local charge modifications and characterization of nitride-oxide-silicon heterostructures

    NASA Astrophysics Data System (ADS)

    Dreyer, M.; Wiesendanger, R.

    1995-10-01

    We have combined a home-built capacitance sensor with a commercial scanning force microscope to obtain a Scanning Capacitance Microscope (SCM). The SCM has been used to study Nitride-Oxide-Silicon (NOS) heterostructures which offer potential applications in charge storage technology. Charge writing and reading on a submicrometer scale is demonstrated with our SCM setup. In addition, SCM appears to be very useful for the characterization of subsurface defects in semiconductor devices which are inaccessible by most of the other scanning probe microscopies. Finally, we introduce a novel spectroscopic mode of SCM operation which offers combined voltage-dependent and spatially resolved information about inhomogeneous charge distributions in semiconductor devices.

  19. Study of the use of Metal-Oxide-Silicon (MOS) devices for particulate detection and monitoring in the earth's atmosphere

    NASA Technical Reports Server (NTRS)

    Brooks, A. D.; Monteith, L. K.; Wortman, J. J.; Mulligan, J. C.

    1974-01-01

    A metal-oxide-silicon (MOS) capacitor-type particulate sensor was evaluated for use in atmospheric measurements. An accelerator system was designed and tested for the purpose of providing the necessary energy to trigger the MOS-type sensor. The accelerator system and the MOS sensor were characterized as a function of particle size and velocity. Diamond particles were used as particulate sources in laboratory tests. Preliminary tests were performed in which the detector was mounted on an aircraft and flown in the vicinity of coal-fired electric generating plants.

  20. Low-power bacteriorhodopsin-silicon n-channel metal-oxide field-effect transistor photoreceiver.

    PubMed

    Shin, Jonghyun; Bhattacharya, Pallab; Yuan, Hao-Chih; Ma, Zhenqiang; Váró, György

    2007-03-01

    A bacteriorhodopsin (bR)-silicon n-channel metal-oxide field-effect transistor (NMOSFET) monolithically integrated photoreceiver is demonstrated. The bR film is selectively formed on an external gate electrode of the transistor by electrophoretic deposition. A modified biasing circuit is incorporated, which helps to match the resistance of the bR film to the input impedance of the NMOSFET and to shift the operating point of the transistor to coincide with the maximum gain. The photoreceiver exhibits a responsivity of 4.7 mA/W. PMID:17392901