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Sample records for coherent extreme ultraviolet

  1. Coherence techniques at extreme ultraviolet wavelengths

    SciTech Connect

    Chang, Chang

    2002-10-01

    The renaissance of Extreme Ultraviolet (EUV) and soft x-ray (SXR) optics in recent years is mainly driven by the desire of printing and observing ever smaller features, as in lithography and microscopy. This attribute is complemented by the unique opportunity for element specific identification presented by the large number of atomic resonances, essentially for all materials in this range of photon energies. Together, these have driven the need for new short-wavelength radiation sources (e.g. third generation synchrotron radiation facilities), and novel optical components, that in turn permit new research in areas that have not yet been fully explored. This dissertation is directed towards advancing this new field by contributing to the characterization of spatial coherence properties of undulator radiation and, for the first time, introducing Fourier optical elements to this short-wavelength spectral region. The first experiment in this dissertation uses the Thompson-Wolf two-pinhole method to characterize the spatial coherence properties of the undulator radiation at Beamline 12 of the Advanced Light Source. High spatial coherence EUV radiation is demonstrated with appropriate spatial filtering. The effects of small vertical source size and beamline apertures are observed. The difference in the measured horizontal and vertical coherence profile evokes further theoretical studies on coherence propagation of an EUV undulator beamline. A numerical simulation based on the Huygens-Fresnel principle is performed.

  2. Employing partially coherent, compact gas-discharge sources for coherent diffractive imaging with extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Bußmann, J.; Odstrčil, M.; Bresenitz, R.; Rudolf, D.; Miao, Jianwei; Brocklesby, W. S.; Grützmacher, D.; Juschkin, L.

    2015-09-01

    Coherent diffractive imaging (CDI) and related techniques enable a new type of diffraction-limited high-resolution extreme ultraviolet (EUV) microscopy. Here, we demonstrate CDI reconstruction of a complex valued object under illumination by a compact gas-discharge EUV light source emitting at 17.3 nm (O VI spectral line). The image reconstruction method accounts for the partial spatial coherence of the radiation and allows imaging even with residual background light. These results are a first step towards laboratory-scale CDI with a gas-discharge light source for applications including mask inspection for EUV lithography, metrology and astronomy.

  3. High-frequency surface acoustic wave propagation in nanaostructures characterized by coherent extreme ultraviolet beams

    SciTech Connect

    Siemens, M.; Li, Q.; Murnane, M.; Kapteyn, H.; Yang, R.; Anderson, E.; Nelson, K.

    2009-03-02

    We study ultrahigh frequency surface acoustic wave propagation in nickel-on-sapphire nanostructures. The use of ultrafast, coherent, extreme ultraviolet beams allows us to extend optical measurements of propagation dynamics of surface acoustic waves to frequencies of nearly 50 GHz, corresponding to wavelengths as short as 125 nm. We repeat the measurement on a sequence of nanostructured samples to observe surface acoustic wave dispersion in a nanostructure series for the first time. These measurements are critical for accurate characterization of thin films using this technique.

  4. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers.

    PubMed

    Li, W; Urbanski, L; Marconi, M C

    2015-12-01

    Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented. PMID:26723999

  5. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

    NASA Astrophysics Data System (ADS)

    Li, W.; Urbanski, L.; Marconi, M. C.

    2015-12-01

    Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

  6. Evidence of partial temporal coherence effects in the linear autocorrelation of extreme ultraviolet laser pulses.

    PubMed

    Le Marec, Andréa; Guilbaud, Olivier; Larroche, Olivier; Klisnick, Annie

    2016-07-15

    We study how the degree of temporal coherence of plasma-based extreme ultraviolet lasers operated in the amplification of the spontaneous emission mode is encoded in the shape of the linear autocorrelation function, which is obtained from the variation of the fringe visibility while varying the delay in a variable path-difference interferometer. We discuss the implications of this effect when the technique is used to infer the spectral properties of the source. Our numerical simulations, based on a partial coherence model developed by other authors for x-ray free electron lasers, are in good agreement with previously reported sets of measurements, illustrating similar statistical properties for both sources. PMID:27420542

  7. Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source.

    PubMed

    Rudolf, Denis; Bußmann, Jan; Odstrčil, Michal; Dong, Minjie; Bergmann, Klaus; Danylyuk, Serhiy; Juschkin, Larissa

    2015-06-15

    Extreme ultraviolet (EUV) spectroscopy is a powerful tool for studying fundamental processes in plasmas as well as for spectral characterization of EUV light sources and EUV optics. However, a simultaneous measurement covering a broadband spectral range is difficult to realize. Here, we propose a method for interferometric broadband Fourier spectroscopy connecting soft x ray and visible spectral ranges with moderate spectral resolution. We present an analytical model to recover the spectrum from a double-slit interferogram. We apply our model for spectral characterization of a partially coherent gas-discharge EUV light source operated with different gases in the spectral range between 10 and 110 nm wavelengths. Our approach allows a simple and fast broadband spectroscopy with fully or partially spatially coherent light sources, for instance, to characterize out-of-band radiation in EUV lithography applications. PMID:26076270

  8. Spatio-temporal coherence of free-electron laser radiation in the extreme ultraviolet determined by a Michelson interferometer

    SciTech Connect

    Hilbert, V.; Rödel, C.; Zastrau, U.; Brenner, G.; Düsterer, S.; Dziarzhytski, S.; Harmand, M.; Przystawik, A.; Redlin, H.; Toleikis, S.; Döppner, T.; Ma, T.; Fletcher, L.; Förster, E.; Glenzer, S. H.; Lee, H. J.; Hartley, N. J.; Kazak, L.; Komar, D.; Skruszewicz, S.; and others

    2014-09-08

    A key feature of extreme ultraviolet (XUV) radiation from free-electron lasers (FELs) is its spatial and temporal coherence. We measured the spatio-temporal coherence properties of monochromatized FEL pulses at 13.5 nm using a Michelson interferometer. A temporal coherence time of (59±8) fs has been determined, which is in good agreement with the spectral bandwidth given by the monochromator. Moreover, the spatial coherence in vertical direction amounts to about 15% of the beam diameter and about 12% in horizontal direction. The feasibility of measuring spatio-temporal coherence properties of XUV FEL radiation using interferometric techniques advances machine operation and experimental studies significantly.

  9. Control of coherent excitation of neon in the extreme ultraviolet regime.

    PubMed

    Plenge, Jürgen; Wirsing, Andreas; Raschpichler, Christopher; Wassermann, Bernhard; Rühl, Eckart

    2011-01-01

    Coherent excitation of a superposition of Rydberg states in neon by the 13th harmonic of an intense 804 nm pulse and the formation of a wave packet is reported. Pump-probe experiments are performed, where the 3d-manifold of the 2p6-->2p5 (2P3/2) 3d [1/2]1- and 2p6-->2p5 (2P3/2) 3d [3/2]1-transitions are excited by an extreme ultraviolet (XUV) radiation pulse, which is centered at 20.05 eV photon energy. The temporal evolution of the excited state population is probed by ionization with a time-delayed 804 nm pulse. Control of coherent transient excitation and wave packet dynamics in the XUV-regime is demonstrated, where the spectral phase of the 13th harmonic is used as a control parameter. Modulation of the phase is achieved by propagation of the XUV-pulse through neon of variable gas density. The experimental results indicate that phase-shaped high-order harmonics can be used to control fundamental coherent excitation processes in the XUV-regime.

  10. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet.

    PubMed

    Kiefer, D; Yeung, M; Dzelzainis, T; Foster, P S; Rykovanov, S G; Lewis, C Ls; Marjoribanks, R S; Ruhl, H; Habs, D; Schreiber, J; Zepf, M; Dromey, B

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein's seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >10(4) times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure. PMID:23612304

  11. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet.

    PubMed

    Kiefer, D; Yeung, M; Dzelzainis, T; Foster, P S; Rykovanov, S G; Lewis, C Ls; Marjoribanks, R S; Ruhl, H; Habs, D; Schreiber, J; Zepf, M; Dromey, B

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein's seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >10(4) times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure.

  12. Real-time and Sub-wavelength Ultrafast Coherent Diffraction Imaging in the Extreme Ultraviolet

    PubMed Central

    Zürch, M.; Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Limpert, J.; Tünnermann, A.; Guggenmos, A.; Kleineberg, U.; Spielmann, C.

    2014-01-01

    Coherent Diffraction Imaging is a technique to study matter with nanometer-scale spatial resolution based on coherent illumination of the sample with hard X-ray, soft X-ray or extreme ultraviolet light delivered from synchrotrons or more recently X-ray Free-Electron Lasers. This robust technique simultaneously allows quantitative amplitude and phase contrast imaging. Laser-driven high harmonic generation XUV-sources allow table-top realizations. However, the low conversion efficiency of lab-based sources imposes either a large scale laser system or long exposure times, preventing many applications. Here we present a lensless imaging experiment combining a high numerical aperture (NA = 0.8) setup with a high average power fibre laser driven high harmonic source. The high flux and narrow-band harmonic line at 33.2 nm enables either sub-wavelength spatial resolution close to the Abbe limit (Δr = 0.8λ) for long exposure time, or sub-70 nm imaging in less than one second. The unprecedented high spatial resolution, compactness of the setup together with the real-time capability paves the way for a plethora of applications in fundamental and life sciences. PMID:25483626

  13. Partially Coherent Quantitative Phase Retrieval with Applications to Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Claus, Rene Andre

    This dissertation presents a new quantitative phase retrieval algorithm that fully models partially coherent imaging in microscopes. Unlike existing algorithms, our algorithm fully considers the pupil function and illumination by using the Weak Object Transfer Function (WOTF). Using an iterative approach, we extend the applicability of the WOTF beyond weakly scattering objects. This allows almost any measurement to be used during phase retrieval. As an example of how this feature can be used to invent practical new measurement schemes, we present the illumination switched pupil. This measurement uses a phase contrast objective and varied illumination to maximize the sensitivity of the microscope to both the phase and amplitude of the sample. Using only two images, the complex field can be recovered with high sensitivity at almost all spatial frequencies. A complete model of imaging in the microscope enables self-calibration of the measurements and improved phase retrieval. Since all important characteristics of the microscope can be incorporated, an optimization over critical parameters, such as the best focus position and image alignment, can be performed after the images have been captured. This allows errors in the calibration to be corrected after the measurements have been performed, improving the accuracy of the recovered field while simplifying the experiments. To verify and apply the algorithm experimentally, we have performed phase retrieval measurements of Extreme Ultraviolet (EUV) photomasks on the zone plate microscope, SHARP, at Lawrence Berkeley National Laboratory (LBNL). Phase retrieval has enabled the quantitative analysis of multilayer roughness and defects. Experiments, comparing the size of defects measured using phase retrieval to measurements performed by AFM, indicate that AFM consistently underestimates the effective height of the buried multilayer defects by 1 nm. Other measurements of defects, comparing the recovered field extracted from

  14. Coherent extreme ultraviolet light amplification by strong-field-enhanced forward scattering.

    PubMed

    Serrat, Carles

    2013-09-27

    We theoretically study the response of He atoms exposed simultaneously to an intense IR pulse and a weak extreme ultraviolet (XUV) pulse with photon energies far from the principal atomic He resonances. We find that XUV forward scattering from the nonstationary electronic wave packet promoted by the intense IR driving field is strongly enhanced as compared with the normal weak scattering from bound or free electrons. Based on this effect, we predict that large amplification of XUV radiation can be achieved in the cutoff spectral region of high-harmonic generation in He gas. PMID:24116781

  15. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

    DOEpatents

    Menoni, Carmen S.; Rocca, Jorge J.; Vaschenko, Georgiy; Bloom, Scott; Anderson, Erik H.; Chao, Weilun; Hemberg, Oscar

    2011-04-26

    Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

  16. Octave-spanning hyperspectral coherent diffractive imaging in the extreme ultraviolet range.

    PubMed

    Meng, Yijian; Zhang, Chunmei; Marceau, Claude; Naumov, A Yu; Corkum, P B; Villeneuve, D M

    2015-11-01

    Soft x-ray microscopy is a powerful imaging technique that provides sub-micron spatial resolution, as well as chemical specificity using core-level near-edge x-ray absorption fine structure (NEXAFS). Near the carbon K-edge (280-300 eV) biological samples exhibit high contrast, and the detailed spectrum contains information about the local chemical environment of the atoms. Most soft x-ray imaging takes place on dedicated beamlines at synchrotron facilities or at x-ray free electron laser facilities. Tabletop femtosecond laser systems are now able to produce coherent radiation at the carbon K-edge and beyond through the process of high harmonic generation (HHG). The broad bandwidth of HHG is seemingly a limitation to imaging, since x-ray optical elements such as Fresnel zone plates require monochromatic sources. Counter-intuitively, the broad bandwidth of HHG sources can be beneficial as it permits chemically-specific hyperspectral imaging. We apply two separate techniques - Fourier transform spectroscopy, and lensless holographic imaging - to obtain images of an object simultaneously at multiple wavelengths using an octave-spanning high harmonic source with photon energies up to 30 eV. We use an interferometric delay reference to correct for nanometer-scale fluctuations between the two HHG sources. PMID:26561164

  17. Octave-spanning hyperspectral coherent diffractive imaging in the extreme ultraviolet range.

    PubMed

    Meng, Yijian; Zhang, Chunmei; Marceau, Claude; Naumov, A Yu; Corkum, P B; Villeneuve, D M

    2015-11-01

    Soft x-ray microscopy is a powerful imaging technique that provides sub-micron spatial resolution, as well as chemical specificity using core-level near-edge x-ray absorption fine structure (NEXAFS). Near the carbon K-edge (280-300 eV) biological samples exhibit high contrast, and the detailed spectrum contains information about the local chemical environment of the atoms. Most soft x-ray imaging takes place on dedicated beamlines at synchrotron facilities or at x-ray free electron laser facilities. Tabletop femtosecond laser systems are now able to produce coherent radiation at the carbon K-edge and beyond through the process of high harmonic generation (HHG). The broad bandwidth of HHG is seemingly a limitation to imaging, since x-ray optical elements such as Fresnel zone plates require monochromatic sources. Counter-intuitively, the broad bandwidth of HHG sources can be beneficial as it permits chemically-specific hyperspectral imaging. We apply two separate techniques - Fourier transform spectroscopy, and lensless holographic imaging - to obtain images of an object simultaneously at multiple wavelengths using an octave-spanning high harmonic source with photon energies up to 30 eV. We use an interferometric delay reference to correct for nanometer-scale fluctuations between the two HHG sources.

  18. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

    DOE PAGES

    Yamazoe, Kenji; Mochi, Iacopo; Goldberg, Kenneth A.

    2014-12-01

    The wavefront retrieval by gradient descent algorithm that is typically applied to coherent or incoherent imaging is extended to retrieve a wavefront from a series of through-focus images by partially coherent illumination. For accurate retrieval, we modeled partial coherence as well as object transmittance into the gradient descent algorithm. However, this modeling increases the computation time due to the complexity of partially coherent imaging simulation that is repeatedly used in the optimization loop. To accelerate the computation, we incorporate not only the Fourier transform but also an eigenfunction decomposition of the image. As a demonstration, the extended algorithm is appliedmore » to retrieve a field-dependent wavefront of a microscope operated at extreme ultraviolet wavelength (13.4 nm). The retrieved wavefront qualitatively matches the expected characteristics of the lens design.« less

  19. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source

    SciTech Connect

    Yamazoe, Kenji; Mochi, Iacopo; Goldberg, Kenneth A.

    2014-12-01

    The wavefront retrieval by gradient descent algorithm that is typically applied to coherent or incoherent imaging is extended to retrieve a wavefront from a series of through-focus images by partially coherent illumination. For accurate retrieval, we modeled partial coherence as well as object transmittance into the gradient descent algorithm. However, this modeling increases the computation time due to the complexity of partially coherent imaging simulation that is repeatedly used in the optimization loop. To accelerate the computation, we incorporate not only the Fourier transform but also an eigenfunction decomposition of the image. As a demonstration, the extended algorithm is applied to retrieve a field-dependent wavefront of a microscope operated at extreme ultraviolet wavelength (13.4 nm). The retrieved wavefront qualitatively matches the expected characteristics of the lens design.

  20. Near-resonant four-wave mixing of attosecond extreme-ultraviolet pulses with near-infrared pulses in neon: Detection of electronic coherences

    NASA Astrophysics Data System (ADS)

    Cao, Wei; Warrick, Erika R.; Fidler, Ashley; Leone, Stephen R.; Neumark, Daniel M.

    2016-08-01

    Coherent narrow-band extreme-ultraviolet (EUV) light is generated by a near-resonant four-wave mixing (FWM) process between attosecond pulse trains and near-infrared pulses in neon gas. The near-resonant FWM process involves one vacuum-ultraviolet (VUV) photon and two near-infrared (NIR) photons and produces new higher-energy frequency components corresponding to the n s /n d to ground-state (2 s22 p6) transitions in the neon atom. The EUV emission exhibits small angular divergence (2 mrad) and monotonically increasing intensity over a pressure range of 0.5-16 Torr, suggesting phase matching in the production of the narrow-bandwidth coherent EUV light. In addition, time-resolved scans of the NIR nonlinear mixing process reveal the detection of a persistent, ultrafast bound electronic wave packet based on a coherent superposition initiated by the VUV pulse in the neon atoms. This FWM process using attosecond pulses offers a means for both efficient narrow-band EUV source generation and time-resolved investigations of ultrafast dynamics.

  1. Extreme ultraviolet lithography machine

    SciTech Connect

    Tichenor, D.A.; Kubiak, G.D.; Haney, S.J.; Sweeney, D.W.

    2000-02-29

    An extreme ultraviolet lithography (EUVL) machine or system is disclosed for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10--14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  2. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  3. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  4. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  5. The Extreme Ultraviolet Explorer mission

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA astronomy mission which will operate in the 70-760A spectral band. The science payload consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. An overview of the planned mission profile is given, and the instrumentation which comprises the science payload is discussed. The EUVE is scheduled for launch in late August 1991.

  6. Extreme ultraviolet Talbot interference lithography.

    PubMed

    Li, Wei; Marconi, Mario C

    2015-10-01

    Periodic nanopatterns can be generated using lithography based on the Talbot effect or optical interference. However, these techniques have restrictions that limit their performance. High resolution Talbot lithography is limited by the very small depth of focus and the demanding requirements in the fabrication of the master mask. Interference lithography, with large DOF and high resolution, is limited to simple periodic patterns. This paper describes a hybrid extreme ultraviolet lithography approach that combines Talbot lithography and interference lithography to render an interference pattern with a lattice determined by a Talbot image. As a result, the method enables filling the arbitrary shaped cells produced by the Talbot image with interference patterns. Detailed modeling, system design and experimental results using a tabletop EUV laser are presented. PMID:26480070

  7. The extreme ultraviolet explorer mission

    NASA Astrophysics Data System (ADS)

    Bowyer, S.; Malina, R. F.

    The Extreme Ultraviolet Explorer (EUVE) mission, currently scheduled for launch in September 1991, is described. The primary purpose of the mission is to survey the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation. The survey will be accomplished with the use of three EUV telescopes, each sensitive to a different segment of the EUV band. A fourth telescope will perform a high sensitivity search of a limited sample of the sky in the shortest wavelength bands. The all-sky survey will be carried out in the first six months of the mission and will be made in four bands, or colors, λλ70-180 Å, 170-250 Å, 400-600 Å, and 500-700 Å. The second phase of the mission, conducted entirely by Guest Observers selected by NASA, will be devoted to spectroscopic observations of EUV sources. The performance of the instrument components is described. The mirrors meet the requirements of the mission, with the best mirror having a full width half energy spread of 4'' and a surface finish of 20 Å. Prototype thin film bandpass filters have been flown on the Space Shuttle and their performance optimized. Prototype detectors have been developed which have 1680 × 1680 pixel imaging capability (RMS) and up to 80% quantum efficiency. A newly invented, high efficiency grazing incidence spectrometer using variable line-space gratings will provide spectral data with ~1 Å resolution. An end-to-end model of the mission, from a stellar source to the resulting scientific data, has been constructed. Hypothetical data from astronomical sources have been processed through this model and are shown.

  8. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Labov, S. E.

    1985-01-01

    Instruments designed to explore different aspects of far and extreme ultraviolet cosmic radiation were studied. The far ultraviolet imager (FUVI) was flown on the Aries sounding rocket. Its unique large format 75mm detector mapped out the far ultraviolet background radiation with a resolution of only a few arc minutes. Analysis of this data indicates to what extent the FUVI background is extra galactic in origin. A power spectrum of the spatial fluctuations will have direct consequences for galactic evolution.

  9. The Diffuse Extreme Ultraviolet Background

    NASA Technical Reports Server (NTRS)

    Vallerga, John; Slavin, Jonathan

    1996-01-01

    Observations of the diffuse EUV background towards 138 different directions using the spectrometers aboard the Extreme Ultraviolet Explorer satellite (EUVE) have been combined into a spectrum from 150A to 730A and represent an effective exposure of 18 million seconds. There is no significant evidence of any non-local line flux in the resultant spectrum such as that from a hot coronal plasma. These results are inconsistent with the Wisconsin C and B broad-band surveys assuming the source is a logT = 5.8 - 6.1 hot plasma in ionization equilibrium with solar abundances, confirming the previous result of Jelinksy, Vallerga and Edelstein) (hereafter Paper 1) using an observation along the ecliptic with the same instrument. To make these results consistent with the previous broad-band surveys, the plasma responsible for the emission must either be depleted in Fe by a factor of approximately 6, be behind an absorbing slab of neutral H with a column of 2 x 10(exp 19)/sq cm, or not be in collisional ionization equilibrium (CIE). One such non-CIE model (Breitswerdt and Schmutzier) that explains the soft x-ray results is also inconsistent with this EUV data.

  10. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  11. Astronomy and the Extreme Ultraviolet Explorer satellite.

    PubMed

    Bowyer, S

    1994-01-01

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  12. Astronomy and the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Bowyer, S.

    1994-01-01

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  13. Extreme Ultraviolet Explorer Bright Source List

    NASA Technical Reports Server (NTRS)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  14. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1985-01-01

    The Far Ultraviolet imager (FUVI) was flown on the Aries class sounding rocket 24.015, producing outstanding results. The diffuse extreme ultraviolet (EUV) background spectrometer which is under construction is described. It will be launched on the Black Brant sounding rocket flight number 27.086. Ongoing design studies of a high resolution spectrometer are discussed. This instrument incorporates a one meter normal incidence mirror and will be suitable for an advanced Spartan mission.

  15. Interference-induced peak splitting in extreme ultraviolet superfluorescence.

    PubMed

    Cui, Ni; Keitel, Christoph H; Macovei, Mihai

    2013-02-15

    We investigate the laser-induced quantum interference in extreme ultraviolet superfluorescence (SF) occurring in a dense gas of Λ-type helium atoms coupled by a coherent laser field in the visible region. Due to the constructive interatomic and intraatomic interferences, the SF can split in two pulses conveniently controlled by the gas density and intensity of the driving field, suggesting potential applications for pump-probe experiments.

  16. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  17. Far and extreme ultraviolet astronomy with ORFEUS

    NASA Technical Reports Server (NTRS)

    Kraemer, G.; Barnstedt, J.; Eberhard, N.; Grewing, M.; Gringel, W.; Haas, C.; Kaelble, A.; Kappelmann, N.; Petrik, J.; Appenzeller, I.

    1990-01-01

    ORFEUS (Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer) is a 1 m normal incidence telescope for spectroscopic investigations of cosmic sources in the far and extreme ultraviolet spectral range. The instrument will be integrated into the freeflyer platform ASTRO-SPAS. ORFEUS-SPAS is scheduled with STS ENDEAVOUR in September 1992. We describe the telescope with its two spectrometer and their capabilities i.e., spectral range, resolution and overall sensitivity. The main classes of objects to be observed with the instrument are discussed and two examples of simulated spectra for the white dwarf HZ43 and an O9-star in LMC are shown.

  18. Improved Radiometry For Extreme-ultraviolet Lithography

    SciTech Connect

    Tarrio, C.; Vest, R.E.; Grantham, S.; Liu, K.; Lucatorto, T.B.; Shaw, P.S.

    2004-05-12

    The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are currently used as standards from the infrared and into the vacuum ultraviolet, however, no radiometric facilities are currently in operation with enough incident power to use an ACR in the extreme-ultraviolet region. Therefore, we have installed transfer optics on an existing beamline to allow the installation of the ACR as an additional endstation. We will describe the current radiometric beamline, the ACR, and the high-throughput beamline, and the transfer-optical system. Finally, we will present the performance of the transfer optics and measurements of the beam profile and incident power of the new endstation.

  19. Extreme Ultraviolet Explorer Science Operation Center

    NASA Technical Reports Server (NTRS)

    Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

    1993-01-01

    The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

  20. Gradient-based inverse extreme ultraviolet lithography.

    PubMed

    Ma, Xu; Wang, Jie; Chen, Xuanbo; Li, Yanqiu; Arce, Gonzalo R

    2015-08-20

    Extreme ultraviolet (EUV) lithography is the most promising successor of current deep ultraviolet (DUV) lithography. The very short wavelength, reflective optics, and nontelecentric structure of EUV lithography systems bring in different imaging phenomena into the lithographic image synthesis problem. This paper develops a gradient-based inverse algorithm for EUV lithography systems to effectively improve the image fidelity by comprehensively compensating the optical proximity effect, flare, photoresist, and mask shadowing effects. A block-based method is applied to iteratively optimize the main features and subresolution assist features (SRAFs) of mask patterns, while simultaneously preserving the mask manufacturability. The mask shadowing effect may be compensated by a retargeting method based on a calibrated shadowing model. Illustrative simulations at 22 and 16 nm technology nodes are presented to validate the effectiveness of the proposed methods. PMID:26368764

  1. Four-wave mixing experiments with extreme ultraviolet transient gratings

    NASA Astrophysics Data System (ADS)

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-04-01

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  2. Four-wave mixing experiments with extreme ultraviolet transient gratings.

    PubMed

    Bencivenga, F; Cucini, R; Capotondi, F; Battistoni, A; Mincigrucci, R; Giangrisostomi, E; Gessini, A; Manfredda, M; Nikolov, I P; Pedersoli, E; Principi, E; Svetina, C; Parisse, P; Casolari, F; Danailov, M B; Kiskinova, M; Masciovecchio, C

    2015-04-01

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  3. Experimental limits of the extreme ultraviolet background

    NASA Technical Reports Server (NTRS)

    Wulf-Mathies, C.; Grewing, M.; Kraemer, G.; Schulz-Luepertz, E.; Kimble, R.; Bixler, J.; Bowyer, S.

    1983-01-01

    Photometric observations of the diffuse extreme ultraviolet background with two photometers having bandpasses of 750-940 A and 1040-1080 A are reported. The payload, which was flown aboard an ARIES sounding rocket in June 1982, is described, including the electron detectors, filters, and calibration. The operation of the probe during the experiment, including its motions, are described. The primary experiment involved spectroscopic observation of the hot white dwarf HZ43. The photometer count rate is shown and the measurements of the diffuse background are compared with theoretical predictions. Despite the lower limits obtained using a narrowband detector, the measurements are not sensitive enough to draw any relevant astrophysical conclusions.

  4. Extreme ultraviolet photoionization of aldoses and ketoses

    NASA Astrophysics Data System (ADS)

    Shin, Joong-Won; Dong, Feng; Grisham, Michael E.; Rocca, Jorge J.; Bernstein, Elliot R.

    2011-04-01

    Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical fragment ions regardless of size, and ketoses, while also generating same ions as aldoses, yields additional features. Extensive fragmentation of the monosaccharides is the result the EUV photons ionizing various inner valence orbitals. The observed fragmentation patterns are not dependent upon hydrogen bonding structure or OH group orientation.

  5. Modeling extreme ultraviolet suppression of electrostatic analyzers

    SciTech Connect

    Gershman, Daniel J.; Zurbuchen, Thomas H.

    2010-04-15

    In addition to analyzing energy-per-charge ratios of incident ions, electrostatic analyzers (ESAs) for spaceborne time-of-flight mass spectrometers must also protect detectors from extreme ultraviolet (EUV) photons from the Sun. The required suppression rate often exceeds 1:10{sup 7} and is generally established in tests upon instrument design and integration. This paper describes a novel technique to model the EUV suppression of ESAs using photon ray tracing integrated into SIMION, the most commonly used ion optics design software for such instruments. The paper compares simulation results with measurements taken from the ESA of the Mass instrument flying onboard the Wind spacecraft. This novel technique enables an active inclusion of EUV suppression requirements in the ESA design process. Furthermore, the simulation results also motivate design rules for such instruments.

  6. The Extreme Ultraviolet Explorer - Overview and calibration

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.; Vallerga, John V.; Jelinsky, Pat; Vedder, Peter W.; Bowyer, Stuart

    1990-01-01

    The Extreme Ultraviolet Explorer (EUVE) is a NASA-funded astronomy mission that will operate in the 70 to 760 A band. The science payload, which has been designed and built by the Space Sciences Laboratory at the University of California, Berkeley, consists of three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument. This paper gives details of the planned mission profile and an overview of the instrumentation that the science payload comprises. Topics such as the thermal design, contamination control, and details of the electronics system are discussed. Finally, the results of the calibration of the various subsystems that make up the EUVE instrumentation are reviewed, and the calibration plan for the integrated EUVE instruments is discussed.

  7. Modeling extreme ultraviolet suppression of electrostatic analyzers.

    PubMed

    Gershman, Daniel J; Zurbuchen, Thomas H

    2010-04-01

    In addition to analyzing energy-per-charge ratios of incident ions, electrostatic analyzers (ESAs) for spaceborne time-of-flight mass spectrometers must also protect detectors from extreme ultraviolet (EUV) photons from the Sun. The required suppression rate often exceeds 1:10(7) and is generally established in tests upon instrument design and integration. This paper describes a novel technique to model the EUV suppression of ESAs using photon ray tracing integrated into SIMION, the most commonly used ion optics design software for such instruments. The paper compares simulation results with measurements taken from the ESA of the Mass instrument flying onboard the Wind spacecraft. This novel technique enables an active inclusion of EUV suppression requirements in the ESA design process. Furthermore, the simulation results also motivate design rules for such instruments.

  8. Bright subcycle extreme ultraviolet bursts from a single dense relativistic electron sheet.

    PubMed

    Ma, W J; Bin, J H; Wang, H Y; Yeung, M; Kreuzer, C; Streeter, M; Foster, P S; Cousens, S; Kiefer, D; Dromey, B; Yan, X Q; Meyer-ter-Vehn, J; Zepf, M; Schreiber, J

    2014-12-01

    Double-foil targets separated by a low density plasma and irradiated by a petawatt-class laser are shown to be a copious source of coherent broadband radiation. Simulations show that a dense sheet of relativistic electrons is formed during the interaction of the laser with the tenuous plasma between the two foils. The coherent motion of the electron sheet as it transits the second foil results in strong broadband emission in the extreme ultraviolet, consistent with our experimental observations.

  9. Bright subcycle extreme ultraviolet bursts from a single dense relativistic electron sheet.

    PubMed

    Ma, W J; Bin, J H; Wang, H Y; Yeung, M; Kreuzer, C; Streeter, M; Foster, P S; Cousens, S; Kiefer, D; Dromey, B; Yan, X Q; Meyer-ter-Vehn, J; Zepf, M; Schreiber, J

    2014-12-01

    Double-foil targets separated by a low density plasma and irradiated by a petawatt-class laser are shown to be a copious source of coherent broadband radiation. Simulations show that a dense sheet of relativistic electrons is formed during the interaction of the laser with the tenuous plasma between the two foils. The coherent motion of the electron sheet as it transits the second foil results in strong broadband emission in the extreme ultraviolet, consistent with our experimental observations. PMID:25526132

  10. Studying Extreme Ultraviolet Wave Transients with a Digital Laboratory: Direct Comparison of Extreme Ultraviolet Wave Observations to Global Magnetohydrodynamic Simulations

    NASA Astrophysics Data System (ADS)

    Downs, Cooper; Roussev, Ilia I.; van der Holst, Bart; Lugaz, Noé; Sokolov, Igor V.; Gombosi, Tamas I.

    2011-02-01

    In this work, we describe our effort to explore the signatures of large-scale extreme ultraviolet (EUV) transients in the solar corona (EUV waves) using a three-dimensional thermodynamic magnetohydrodynamic model. We conduct multiple simulations of the 2008 March 25 EUV wave (~18:40 UT), observed both on and off of the solar disk by the STEREO-A and B spacecraft. By independently varying fundamental parameters thought to govern the physical mechanisms behind EUV waves in each model, such as the ambient magneto-sonic speed, eruption free energy, and eruption handedness, we are able to assess their respective contributions to the transient signature. A key feature of this work is the ability to synthesize the multi-filter response of the STEREO Extreme UltraViolet Imagers directly from model data, which gives a means for direct interpretation of EUV observations with full knowledge of the three-dimensional magnetic and thermodynamic structures in the simulations. We discuss the implications of our results with respect to some commonly held interpretations of EUV waves (e.g., fast-mode magnetosonic wave, plasma compression, reconnection front, etc.) and present a unified scenario which includes both a wave-like component moving at the fast magnetosonic speed and a coherent driven compression front related to the eruptive event itself.

  11. Extreme ultraviolet spectral irradiance measurements since 1946

    NASA Astrophysics Data System (ADS)

    Schmidtke, G.

    2015-03-01

    In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial

  12. Four wave mixing experiments with extreme ultraviolet transient gratings

    PubMed Central

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-01-01

    Four wave mixing (FWM) processes, based on third-order non-linear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enables to explore dynamics inaccessible by linear methods.1-7 The coherent and multi-wave nature of FWM approach has been crucial in the development of cutting edge technologies, such as silicon photonics,8 sub-wavelength imaging9 and quantum communications.10 All these technologies operate with optical wavelengths, which limit the spatial resolution and do not allow probing excitations with energy in the eV range. The extension to shorter wavelengths, that is the extreme ultraviolet (EUV) and soft-x-ray (SXR) range, will allow to improve the spatial resolution and to expand the excitation energy range, as well as to achieve elemental selectivity by exploiting core resonances.5-7,11-14 So far FWM applications at these wavelengths have been prevented by the absence of coherent sources of sufficient brightness and suitable experimental setups. Our results show how transient gratings, generated by the interference of coherent EUV pulses delivered by the FERMI free electron laser (FEL),15 can be used to stimulate FWM processes at sub-optical wavelengths. Furthermore, we have demonstrated the possibility to read the time evolution of the FWM signal, which embodies the dynamics of coherent excitations as molecular vibrations. This result opens the perspective for FWM with nanometer spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics.5-7 The theoretical possibility to realize these applications have already stimulated dedicated and ongoing FEL developments;16-20 today our results show that FWM at sub-optical wavelengths is feasible and would be the spark to the further advancements of the present and new sources. PMID:25855456

  13. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  14. Extreme ultraviolet-induced photoionized plasmas

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemyslaw; Fiedorowicz, Henryk; Fok, Tomasz; Jarocki, Roman; Szczurek, Miroslaw

    2014-05-01

    In this work photoionized plasmas were created by irradiation of He or Ne gases with a focused extreme ultraviolet (EUV) beam from one of two laser-plasma sources employing Nd:YAG laser systems. The first of them was a 10 Hz laser-plasma EUV source, based on a double-stream gas-puff target, irradiated with a 3 ns per 0.8 J laser pulse. EUV radiation in this case was focused using a gold-plated grazing incidence ellipsoidal collector. The second source was based on a 10 ns per 10 J per 10 Hz laser system. In this case EUV radiation was focused using a gold-plated grazing incidence multifoil collector. Gases were injected into the interaction region, perpendicularly to an optical axis of the irradiation system, using an auxiliary gas puff valve. Spectral measurements in the EUV range were performed. In all cases the most intense emission lines were assigned to singly charged ions. The other emission lines belong to atoms or doubly charged ions.

  15. Initial results from the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Bowyer, S.; Malina, R. F.

    1993-01-01

    Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

  16. Extreme ultraviolet high-harmonic spectroscopy of solids.

    PubMed

    Luu, T T; Garg, M; Kruchinin, S Yu; Moulet, A; Hassan, M Th; Goulielmakis, E

    2015-05-28

    Extreme ultraviolet (EUV) high-harmonic radiation emerging from laser-driven atoms, molecules or plasmas underlies powerful attosecond spectroscopy techniques and provides insight into fundamental structural and dynamic properties of matter. The advancement of these spectroscopy techniques to study strong-field electron dynamics in condensed matter calls for the generation and manipulation of EUV radiation in bulk solids, but this capability has remained beyond the reach of optical sciences. Recent experiments and theoretical predictions paved the way to strong-field physics in solids by demonstrating the generation and optical control of deep ultraviolet radiation in bulk semiconductors, driven by femtosecond mid-infrared fields or the coherent up-conversion of terahertz fields to multi-octave spectra in the mid-infrared and optical frequencies. Here we demonstrate that thin films of SiO2 exposed to intense, few-cycle to sub-cycle pulses give rise to wideband coherent EUV radiation extending in energy to about 40 electronvolts. Our study indicates the association of the emitted EUV radiation with intraband currents of multi-petahertz frequency, induced in the lowest conduction band of SiO2. To demonstrate the applicability of high-harmonic spectroscopy to solids, we exploit the EUV spectra to gain access to fine details of the energy dispersion profile of the conduction band that are as yet inaccessible by photoemission spectroscopy in wide-bandgap dielectrics. In addition, we use the EUV spectra to trace the attosecond control of the intraband electron motion induced by synthesized optical transients. Our work advances lightwave electronics in condensed matter into the realm of multi-petahertz frequencies and their attosecond control, and marks the advent of solid-state EUV photonics.

  17. Extreme ultraviolet high-harmonic spectroscopy of solids.

    PubMed

    Luu, T T; Garg, M; Kruchinin, S Yu; Moulet, A; Hassan, M Th; Goulielmakis, E

    2015-05-28

    Extreme ultraviolet (EUV) high-harmonic radiation emerging from laser-driven atoms, molecules or plasmas underlies powerful attosecond spectroscopy techniques and provides insight into fundamental structural and dynamic properties of matter. The advancement of these spectroscopy techniques to study strong-field electron dynamics in condensed matter calls for the generation and manipulation of EUV radiation in bulk solids, but this capability has remained beyond the reach of optical sciences. Recent experiments and theoretical predictions paved the way to strong-field physics in solids by demonstrating the generation and optical control of deep ultraviolet radiation in bulk semiconductors, driven by femtosecond mid-infrared fields or the coherent up-conversion of terahertz fields to multi-octave spectra in the mid-infrared and optical frequencies. Here we demonstrate that thin films of SiO2 exposed to intense, few-cycle to sub-cycle pulses give rise to wideband coherent EUV radiation extending in energy to about 40 electronvolts. Our study indicates the association of the emitted EUV radiation with intraband currents of multi-petahertz frequency, induced in the lowest conduction band of SiO2. To demonstrate the applicability of high-harmonic spectroscopy to solids, we exploit the EUV spectra to gain access to fine details of the energy dispersion profile of the conduction band that are as yet inaccessible by photoemission spectroscopy in wide-bandgap dielectrics. In addition, we use the EUV spectra to trace the attosecond control of the intraband electron motion induced by synthesized optical transients. Our work advances lightwave electronics in condensed matter into the realm of multi-petahertz frequencies and their attosecond control, and marks the advent of solid-state EUV photonics. PMID:26017451

  18. The Solar Extreme Ultraviolet Monitor for MAVEN

    NASA Astrophysics Data System (ADS)

    Eparvier, F. G.; Chamberlin, P. C.; Woods, T. N.; Thiemann, E. M. B.

    2015-12-01

    The Extreme Ultraviolet (EUV) monitor is an instrument on the NASA Mars Atmosphere and Volatile EvolutioN (MAVEN) mission, designed to measure the variability of the solar soft x-rays and EUV irradiance at Mars. The solar output in this wavelength range is a primary energy input to the Mars atmosphere and a driver for the processes leading to atmospheric escape. The MAVEN EUV monitor consists of three broadband radiometers. The radiometers consist of silicon photodiodes with different bandpass-limiting filters for each channel. The filters for the radiometers are: Channel A: thin foil C/Al/Nb/C for 0.1-3 nm and 17-22 nm, Channel B: thin foil C/Al/Ti/C for 0.1-7 nm, and Channel C: interference filter for 121-122 nm. A fourth, covered photodiode is used to monitor variations in dark signal due to temperature and radiation background changes. The three science channels will monitor emissions from the highly variable corona and transition region of the solar atmosphere. The EUV monitor is mounted on the top deck of the MAVEN spacecraft and is pointed at the Sun for most of its orbit around Mars. The measurement cadence is 1-second. The broadband irradiances can be used to monitor the most rapid changes in solar irradiance due to flares. In combination with time-interpolated observations at Earth of slower varying solar spectral emissions, the broadband MAVEN EUV monitor measurements will also be used in a spectral irradiance model to generate the full EUV spectrum at Mars from 0 to 190 nm in 1-nm bins on a time cadence of 1-minute and daily averages.

  19. The Extreme Ultraviolet Variability of Quasars

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Marziani, Paola; Zhang, Shaohua; Muzahid, Sowgat; O’Dea, Christopher P.

    2016-10-01

    We study the extreme ultraviolet (EUV) variability (rest frame wavelengths 500–920 Å) of high-luminosity quasars using Hubble Space Telescope (HST) (low to intermediate redshift sample) and Sloan Digital sky Survey (SDSS) (high redshift sample) archives. The combined HST and SDSS data indicates a much more pronounced variability when the sampling time between observations in the quasar rest frame is \\gt 2× {10}7 {{s}} compared to \\lt 1.5× {10}7 s. Based on an excess variance analysis, for time intervals \\lt 2× {10}7 {{s}} in the quasar rest frame, 10% of the quasars (4/40) show evidence of EUV variability. Similarly, for time intervals \\gt 2× {10}7 {{s}} in the quasar rest frame, 55% of the quasars (21/38) show evidence of EUV variability. The propensity for variability does not show any statistically significant change between 2.5× {10}7 {{s}} and 3.16× {10}7 {{s}} (1 year). The temporal behavior is one of a threshold time interval for significant variability as opposed to a gradual increase on these timescales. A threshold timescale can indicate a characteristic spatial dimension of the EUV region. We explore this concept in the context of the slim disk models of accretion. We find that for rapidly spinning black holes, the radial infall time to the plunge region of the optically thin surface layer of the slim disk that is responsible for the preponderance of the EUV flux emission (primarily within 0–7 black hole radii from the inner edge of the disk) is consistent with the empirically determined variability timescale.

  20. Spectral observations of the extreme ultraviolet background.

    PubMed

    Labov, S E; Bowyer, S

    1991-04-20

    A grazing incidence spectrometer was designed to measure the diffuse extreme ultraviolet background. It was flown on a sounding rocket, and data were obtained on the diffuse background between 80 and 650 angstroms. These are the first spectral measurements of this background below 520 angstroms. Several emission features were detected, including interplanetary He I 584 angstroms emission and geocoronal He II 304 angstroms emission. Other features observed may originate in a hot ionized interstellar gas, but if this interpretation is correct, gas at several different temperatures is present. The strongest of these features is consistent with O V emission at 630 angstroms. This emission, when combined with upper limits for other lines, restricts the temperature of this component to 5.5 < log T < 5.7, in agreement with temperatures derived from O VI absorption studies. A power-law distribution of temperatures is consistent with this feature only if the power-law coefficient is negative, as is predicted for saturated evaporation of clouds in a hot medium. In this case, the O VI absorption data confine the filling factor of the emission of f < or = 4% and the pressure to more than 3.7 x 10(4) cm-3 K, substantially above ambient interstellar pressure. Such a pressure enhancement has been predicted for clouds undergoing saturated evaporation. Alternatively, if the O V emission covers a considerable fraction of the sky, it would be a major source of ionization. A feature centered at about 99 angstroms is well fitted by a cluster of Fe XVIII and Fe XIX lines from gas at log T = 6.6-6.8. These results are consistent with previous soft X-ray observations with low-resolution detectors. A feature found near 178 angstroms is consistent with Fe X and Fe XI emission from gas at log T = 6; this result is consistent with results from experiments employing broad-band soft X-ray detectors.

  1. STEREO's Extreme UltraViolet Imager (EUVI)

    NASA Technical Reports Server (NTRS)

    2007-01-01

    At a pixel resolution of 2048x2048, the STEREO EUVI instrument provides views of the Sun in ultraviolet light that rivals the full-disk views of SOHO/EIT. This image is through the 171 Angstrom (ultraviolet) filter which is characteristic of iron ions (missing eight and nine electrons) at 1 million degrees. There is a short data gap in the latter half of the movie that creates a freeze and then jump in the data view. This is a movie of the Sun in 171 Angstrom ultraviolet light. The time frame is late January, 2007

  2. Extreme ultraviolet transmission of a synthetic diamond thin film

    NASA Technical Reports Server (NTRS)

    Vallerga, John V.; Gibson, J. L.; Knowles, J. L.

    1991-01-01

    Measurements are presented of a thin film of synthetic diamond at various wavelengths in the extreme ultraviolet. The synthetic diamond combines the transmission properties of carbon with the strength, density, and ruggedness of a natural diamond. The Extreme Ultraviolet Transmission (EUV) of a film of the synthetic diamond has shown the existence of a thin surface layer of silicon, probably in the form of silicon carbide, which is not a contaminant layer.

  3. Frequency combs and precision spectroscopy in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Cingöz, Arman

    2012-06-01

    Development of the optical frequency comb has revolutionized optical metrology and precision spectroscopy due to its ability to provide a precise link between microwave and optical frequencies. A novel application that aims to extend the precision and accuracy obtained to the extreme ultraviolet (XUV) is the generation of XUV frequency combs via intracavity high harmonic generation (HHG). Recently, we have been able to generate > 200 μW average power per harmonic and demonstrate the comb structure of the high harmonics by resolving atomic argon and neon lines at 82 and 63 nm, respectively [1]. The argon transition linewidth of 10 MHz, limited by residual Doppler broadening, is unprecedented in this spectral region and places a stringent upper limit on the linewidth of individual comb teeth. To overcome this limitation, we have constructed two independent intracavity HHG sources to study the phase coherence directly via the heterodyne beats between them. With these developments, ultrahigh precision spectroscopy in the XUV is within grasp and has a wide range of applications that include tests of bound state quantum electrodynamics, development of nuclear clocks, and searches for variation of fundamental constants using the enhanced sensitivity of highly charged ions.[4pt] [1] Arman Cing"oz et al., Nature 482, 68 (2012).

  4. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

    PubMed

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  5. The Extreme Ultraviolet Explorer mission - Overview and initial results

    NASA Technical Reports Server (NTRS)

    Haisch, B.; Bowyer, S.; Malina, R. F.

    1993-01-01

    The history of extreme ultraviolet (EUV) astronomy is briefly reviewed, and an overview of the Extreme Ultraviolet Explorer mission, launched into a near-earth (550 km) orbit on June 7, 1992, is presented. First, the principal objective of the mission are summarized. The instrumentation and operation of the mission are then described, with particular attention given to the sky survey instruments, the deep survey instrument, and the spectrometers. The discussion also covers the current view of the interstellar medium, early results from the mission, and future prospects for EUV astronomy.

  6. Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

    NASA Astrophysics Data System (ADS)

    Amano, Tsuyoshi; Terasawa, Tsuneo; Watanabe, Hidehiro; Toyoda, Mitsunori; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo

    2014-04-01

    Influences of phase defect structures on extreme ultraviolet (EUV) microscope images were examined. Phase defects on the bottom of a multilayer (ML) do not always propagate vertically upward to the ML's top surface. For this study, two types of masks were prepared. One was an EUV blank with programmed phase defects made of lines in order to analyze the inclination angle of the phase defects. The other was an EUV mask that consists of programmed dot type phase defects 80 nm wide and 2.4 nm high with absorber patterns of half-pitch 88-nm lines-and-spaces. The positions of the phase defects relative to the absorber lines were designed to be shifted accordingly. Transmission electron microscope observations revealed that the line type phase defects starting from the bottom surface of the ML propagated toward the ML's top surface, while inclined toward the center of the EUV blank. At the distances of 0 and 66 mm from the center of the EUV blank, the inclination angles varied from 0 to 4 deg. The impacts of the inclination angles on EUV microscope images were significant even though the positions of the phase defect relative to the absorber line, as measured by a scanning probe microscope, were the same.

  7. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak

    2006-10-03

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

  8. Solid state laser driver for Extreme Ultraviolet Lithography. Revision 1

    SciTech Connect

    Zapata, L.E.; Honig, J.; Reichert, P.; Hackel, L.A.

    1994-05-01

    We describe the design and initial performance of a Nd:YAG laser master oscillator/phase conjugated power amplifier as a driver for extreme ultraviolet lithography. The design provides 0.5 to 1 joule per pulse with about 5 ns pulse width and excellent beam quality up through 1.5 kHz repetition frequency.

  9. Extreme ultraviolet lithography: A few more pieces of the puzzle

    SciTech Connect

    Anderson, Christopher N.

    2009-05-20

    The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this

  10. Method for the Characterization of Extreme-Ultraviolet Photoresist Outgassing.

    PubMed

    Tarrio, Charles

    2009-01-01

    Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules emitted by the photoresist is measured using a pressure-rise method in a closed vacuum chamber, with the pressure measured by mechanical means using a capacitance displacement gauge. To provide identification and relative abundances, the outgassed molecules are then collected in an evacuated trap cooled by liquid nitrogen for subsequent analysis by gas chromatography with mass spectrometry. We will discuss the design and performance of the system.

  11. Grating configurations to compress extreme-ultraviolet ultrashort pulses.

    PubMed

    Frassetto, Fabio; Poletto, Luca

    2015-09-10

    It is here discussed the design of ultrafast extreme-ultraviolet (XUV) grating compressors that can be used to condition the spectral phase of ultrashort chirped pulses to compensate for the phase chirp and get closer to the Fourier limit. We discuss the two configurations that can be used to realize the compressor, the classical diffraction mount, and the off-plane one. The concept is applied to the realization of a XUV compressor with applications to free-electron lasers.

  12. Telescience - Concepts and contributions to the Extreme Ultraviolet Explorer mission

    NASA Technical Reports Server (NTRS)

    Marchant, Will; Dobson, Carl; Chakrabarti, Supriya; Malina, Roger F.

    1987-01-01

    It is shown how the contradictory goals of low-cost and fast data turnaround characterizing the Extreme Ultraviolet Explorer (EUVE) mission can be achieved via the early use of telescience style transparent tools and simulations. The use of transparent tools reduces the parallel development of capability while ensuring that valuable prelaunch experience is not lost in the operations phase. Efforts made to upgrade the 'EUVE electronics' simulator are described.

  13. Ultraviolet and extreme ultraviolet spectroscopy of the solar corona at the Naval Research Laboratory.

    PubMed

    Moses, J D; Ko, Y-K; Laming, J M; Provornikova, E A; Strachan, L; Beltran, S Tun

    2015-11-01

    We review the history of ultraviolet and extreme ultraviolet spectroscopy with a specific focus on such activities at the Naval Research Laboratory and on studies of the extended solar corona and solar-wind source regions. We describe the problem of forecasting solar energetic particle events and discuss an observational technique designed to solve this problem by detecting supra-thermal seed particles as extended wings on spectral lines. Such seed particles are believed to be a necessary prerequisite for particle acceleration by heliospheric shock waves driven by a coronal mass ejection. PMID:26560611

  14. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    NASA Astrophysics Data System (ADS)

    Attwood, David

    2004-12-01

    filaments, for both Xe and Sn. The embodiment of electrical discharge plasmas and laser-produced plasmas into commercially available EUV sources, with EUV powers that project to suitable levels, is presented in the fifth paper by Uwe Stamm of XTREME Technologies in Göttingen. For discharge produced plasmas, thermal loading and electrode erosion are significant issues. Vladimir Borisov and his colleagues, at the Troitsk Institute outside Moscow, address these issues and provide novel ideas for the multiplexing of several discharge plasmas feeding a single optical system. Igor Fomenkov and his colleagues at Cymer in San Diego describe issues associated with a dense plasma focus pinch, including a comparison of operations with both positive and negative polarity. In the eighth paper, Malcolm McGeoch of Plex in Massachusetts provides a theoretical description of the vaporization and ionization of spherical tin droplets in discharge plasma. Together this cluster of papers provides a broad review of the current status of high power EUV plasma sources for semiconductor manufacturing. This very current topic, of intense interest worldwide, is considered further in a book [4] of collected papers to become available in mid-2005. Additionally, a special journal issue emphasizing coherent EUV sources, albeit at lower average powers, is soon to appear [5]. References [1] http://public.itrsr.net [2] Attwood D 2000 Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press) www.coe.Berkeley.edu/AST/sxreuv [3] Moore G E 1965 Cramming More Components onto Integrated Circuits Electronics Magazine 114 Moore G E 1995 Lithography and the Future of Moore's Law SPIE 243 2 [4] Bakshi V ed 2005 EUV Sources for Lithography (Bellingham WA:SPIE) at press [5] IEEE J. Special Topics in Quantum Electronics, Short Wavelength and EUV Lasers 10 Dec 2004 at press

  15. Extreme Ultraviolet Explorer. Long look at the next window

    NASA Technical Reports Server (NTRS)

    Maran, Stephen P.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

  16. Ptychographic imaging with a compact gas-discharge plasma extreme ultraviolet light source.

    PubMed

    Odstrcil, M; Bussmann, J; Rudolf, D; Bresenitz, R; Miao, Jianwei; Brocklesby, W S; Juschkin, L

    2015-12-01

    We report the demonstration of a scanning probe coherent diffractive imaging method (also known as ptychographic CDI) using a compact and partially coherent gas-discharge plasma source of extreme ultraviolet (EUV) radiation at a 17.3 nm wavelength. Until now, CDI has been mainly carried out with coherent, high-brightness light sources, such as third generation synchrotrons, x-ray free-electron lasers, and high harmonic generation. Here we performed ptychographic lensless imaging of an extended sample using a compact, lab-scale source. The CDI reconstructions were achieved by applying constraint relaxation to the CDI algorithm. Experimental results indicate that our method can handle the low spatial coherence and broadband nature of the EUV illumination, as well as the residual background due to visible light emitted by the gas-discharge source. The ability to conduct ptychographic imaging with lab-scale and partially coherent EUV sources is expected to significantly expand the applications of this powerful CDI method. PMID:26625054

  17. Ptychographic imaging with a compact gas-discharge plasma extreme ultraviolet light source.

    PubMed

    Odstrcil, M; Bussmann, J; Rudolf, D; Bresenitz, R; Miao, Jianwei; Brocklesby, W S; Juschkin, L

    2015-12-01

    We report the demonstration of a scanning probe coherent diffractive imaging method (also known as ptychographic CDI) using a compact and partially coherent gas-discharge plasma source of extreme ultraviolet (EUV) radiation at a 17.3 nm wavelength. Until now, CDI has been mainly carried out with coherent, high-brightness light sources, such as third generation synchrotrons, x-ray free-electron lasers, and high harmonic generation. Here we performed ptychographic lensless imaging of an extended sample using a compact, lab-scale source. The CDI reconstructions were achieved by applying constraint relaxation to the CDI algorithm. Experimental results indicate that our method can handle the low spatial coherence and broadband nature of the EUV illumination, as well as the residual background due to visible light emitted by the gas-discharge source. The ability to conduct ptychographic imaging with lab-scale and partially coherent EUV sources is expected to significantly expand the applications of this powerful CDI method.

  18. Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source.

    PubMed

    Baksh, Peter D; Odstrčil, Michal; Kim, Hyun-Su; Boden, Stuart A; Frey, Jeremy G; Brocklesby, William S

    2016-04-01

    High-harmonic generation (HHG) provides a laboratory-scale source of coherent radiation ideally suited to lensless coherent diffractive imaging (CDI) in the EUV and x-ray spectral region. Here we demonstrate transmission extreme ultraviolet (EUV) ptychography, a scanning variant of CDI, using radiation at a wavelength around 29 nm from an HHG source. Image resolution is diffraction-limited at 54 nm and fields of view up to ∼100  μm are demonstrated. These results demonstrate the potential for wide-field, high-resolution, laboratory-scale EUV imaging using HHG-based sources with potential application in biological imaging or EUV lithography pellicle inspection. PMID:27192225

  19. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  20. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  1. Extreme ultraviolet observations from voyager 2 encounter with jupiter.

    PubMed

    Sandel, B R; Shemansky, D E; Broadfoot, A L; Bertaux, J L; Blamont, J E; Belton, M J; Ajello, J M; Holberg, J B; Atreya, S K; Donahue, T M; Moos, H W; Strobel, D F; McConnell, J C; Dalgarno, A; Goody, R; McElroy, M B; Takacs, P Z

    1979-11-23

    Extreme ultraviolet spectral observations of the Jovian planetary system made during the Voyager 2 encounter have extended our knowledge of many of the phenomena and physical processes discovered by the Voyager 1 ultraviolet spectrometer. In the 4 months between encounters, the radiation from Io's plasma torus has increased in intensity by a factor of about 2. This change was accompanied by a decrease in plasma temperature of about 30 percent. The high-latitude auroral zones have been positively associated with the magnetic projection of the plasma torus onto the planet. Emission in molecular hydrogen bands has been detected from the equatorial regions of Jupiter, indicating planetwide electron precipitation. Hydrogen Lyman alpha from the dark side of the planet has been measured at an intensity of about 1 kilorayleigh. An observation of the occultation of alpha Leonis by Jupiter was carried out successfully and the data are being analyzed in detail.

  2. Extreme ultraviolet induced defects on few-layer graphene

    NASA Astrophysics Data System (ADS)

    Gao, A.; Rizo, P. J.; Zoethout, E.; Scaccabarozzi, L.; Lee, C. J.; Banine, V.; Bijkerk, F.

    2013-07-01

    We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e., relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H2 background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy results show that the sp2 bonded carbon fraction decreases while the sp3 bonded carbon and oxide fraction increases with exposure dose. Our experimental results confirm that even in reducing environment oxidation is still one of the main source of inducing defects.

  3. Extreme ultraviolet emission spectra of Gd and Tb ions

    SciTech Connect

    Kilbane, D.; O'Sullivan, G.

    2010-11-15

    Theoretical extreme ultraviolet emission spectra of gadolinium and terbium ions calculated with the Cowan suite of codes and the flexible atomic code (FAC) relativistic code are presented. 4d-4f and 4p-4d transitions give rise to unresolved transition arrays in a range of ions. The effects of configuration interaction are investigated for transitions between singly excited configurations. Optimization of emission at 6.775 nm and 6.515 nm is achieved for Gd and Tb ions, respectively, by consideration of plasma effects. The resulting synthetic spectra are compared with experimental spectra recorded using the laser produced plasma technique.

  4. MoRu/Be multilayers for extreme ultraviolet applications

    DOEpatents

    Bajt, Sasa C.; Wall, Mark A.

    2001-01-01

    High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

  5. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  6. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  7. Extreme ultraviolet spectrometer based on a transmission electron microscopy grid

    SciTech Connect

    Sistrunk, Emily; Gühr, Markus

    2014-12-12

    Here, we performed extreme ultraviolet spectroscopy using an 80 lines/mm transmission electron microscope mesh as the dispersive element. We also present the usefulness of this instrument for dispersing a high harmonic spectrum from the 13th to the 29th harmonic of a Ti:sapph laser, corresponding to a wavelength range from 60 to 27 nm. The resolution of the instrument is limited by the image size of the high harmonic generation region on the detector. Finally, the resolution in first order diffraction is under 2 nm over the entire spectral range with a resolving power around 30.

  8. Results from the calibration of the Extreme Ultraviolet Explorer instruments

    NASA Technical Reports Server (NTRS)

    Welsh, Barry Y.; Jelinsky, Pat; Vedder, Peter W.; Vallerga, John V.; Finley, David S.; Malina, Roger F.

    1991-01-01

    The paper describes the main features and selected results of the calibration of the scientific instruments to be flown on the Extreme Ultraviolet Explorer in 1991. The instrument payload includes three grazing incidence scanning telescopes and an EUV spectrometer/deep survey instrument covering the spectral region 70-800 A. The measured imaging characteristics, the effective areas, and the details of spectral responses of the instruments are presented. Diagrams of the cross-sectional views of the scanning telescope and the deep-survey/spectrometer telescope are included.

  9. Extreme ultraviolet spectrometer based on a transmission electron microscopy grid

    NASA Astrophysics Data System (ADS)

    Sistrunk, Emily; Gühr, Markus

    2015-01-01

    We performed extreme ultraviolet spectroscopy using an 80 lines/mm transmission electron microscope mesh as the dispersive element. We present the usefulness of this instrument for dispersing a high harmonic spectrum from the 13th to the 29th harmonic of a Ti:sapph laser, corresponding to a wavelength range from 60 to 27 nm. The resolution of the instrument is limited by the image size of the high harmonic generation region on the detector. The resolution in first order diffraction is under 2 nm over the entire spectral range with a resolving power around 30.

  10. Characteristics of extreme ultraviolet emission from high-Z plasmas

    NASA Astrophysics Data System (ADS)

    Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

    2016-03-01

    We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

  11. Interferometry in the Extreme Ultraviolet and X-Ray

    NASA Technical Reports Server (NTRS)

    Cash, W.; Shipley, A.; Osterman, S.; Joy, M. K.

    2000-01-01

    We report on demonstration of an x-ray interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and soft x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. Our system, by using two separate optical channels to create interference from two areas of the wavefront, has broad band response and much higher efficiency. We discuss some applications of this technique to astronomy and microscopy including the possibility of eventually capturing a micro-arcsecond image of a black hole.

  12. Understanding the Early Evolution of M dwarf Extreme Ultraviolet Radiation

    NASA Astrophysics Data System (ADS)

    Peacock, Sarah; Barman, Travis; Shkolnik, Evgenya

    2015-11-01

    The chemistry and evolution of planetary atmospheres depends on the evolution of high-energy radiation emitted by its host star. High levels of extreme ultraviolet (EUV) radiation can drastically alter the atmospheres of terrestrial planets through ionizing, heating, expanding, chemically modifying and eroding them during the first few billion years of a planetary lifetime. While there is evidence that stars emit their highest levels of far and near ultraviolet (FUV; NUV) radiation in the earliest stages of their evolution, we are currently unable to directly measure the EUV radiation. Most previous stellar atmosphere models under-predict FUV and EUV emission from M dwarfs; here we present new models for M stars that include prescriptions for the hot, lowest density atmospheric layers (chromosphere, transition region and corona), from which this radiation is emitted. By comparing our model spectra to GALEX near and far ultraviolet fluxes, we are able to predict the evolution of EUV radiation for M dwarfs from 10 Myr to a few Gyr. This research is the next major step in the HAZMAT (HAbitable Zones and M dwarf Activity across Time) project to analyze how the habitable zone evolves with the evolving properties of stellar and planetary atmospheres.

  13. Extreme ultraviolet spectroscopy of PKS 2155-304.

    PubMed

    Fruscione, A; Bowyer, S; Konigl, A; Kahn, S M

    1994-02-20

    We present the extreme ultraviolet (75-110 angstroms) spectrum of the BL Lac object PKS 2155-304, the first spectrum of an extragalactic source obtained with the Extreme Ultraviolet Explorer. The spectrum shows a generally smooth continuum, which can be modeled by a single power law plus interstellar absorption, and possibly an absorption feature at approximately 80 angstroms. The best fit to the data suggests that the EUV spectrum can be interpreted as a simple extrapolation of the X-ray continuum, with an energy index alpha approximately 1.6; however, shallower or steeper power laws with indices between -0.4 and 2.7 cannot be ruled out by the existing EUV data alone. The data provide strong constraints on the interstellar neutral H and He along the line of sight. Using a column density of 1.36 x 10(20) cm-2 for the Galactic neutral hydrogen along the PKS 2155-304 line of sight, the neutral helium column density is constrained to be 9%-10% of the hydrogen amount.

  14. Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography

    SciTech Connect

    Wedowski, M.; Gullikson, E.M.; Underwood, J.H.; Spiller, E.A.; Montcalm, C.; Kearney, P.A.; Bajt, S.; Schmidt, M.A.; Folta, J.A.

    1999-11-01

    The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2 % for reflectivity and 0.002 nm for wavelength.

  15. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.

    PubMed

    Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

    2015-11-01

    In addition to the development of extreme ultraviolet lithography (EUVL), studies on beyond extreme ultraviolet lithography (BEUVL), which uses radiation with a wavelength of 6.7 nm, are in progress for their application in high-volume manufacturing. The BEUV wavelength, which is much shorter than the EUV wavelength, improves the resolution of patterned features. However, suitable materials for the mask stack of BEUVL are still under development. In this study, the applicability of metallic materials, such as Ni, Co, Ir, W, and Ta, as the absorber in a binary-intensity BEUVL mask was evaluated. The mask-imaging properties were simulated by adopting a thickness that ensured a reflectivity of <1% for each material. Furthermore, we used a multilayered La/B mirror--which exhibited a high reflectivity at a wavelength of 6.7 nm--because BEUV light is absorbed by most materials, and therefore uses reflective optics as desired. The numerical aperture (NA), angle of incidence, and demagnification factor were 0.5 and 0.6, 6 degrees, and 8x, respectively. We confirmed that a line-and-space pattern with a half-pitch of 11 nm can be patterned with metallic absorbers by using a high NA. PMID:26726569

  16. Evaluation of Metal Absorber Materials for Beyond Extreme Ultraviolet Lithography.

    PubMed

    Hong, Seongchul; Kim, Jung Sik; Lee, Jae Uk; Lee, Seung Min; Kim, Jung Hwan; Ahn, Jinho

    2015-11-01

    In addition to the development of extreme ultraviolet lithography (EUVL), studies on beyond extreme ultraviolet lithography (BEUVL), which uses radiation with a wavelength of 6.7 nm, are in progress for their application in high-volume manufacturing. The BEUV wavelength, which is much shorter than the EUV wavelength, improves the resolution of patterned features. However, suitable materials for the mask stack of BEUVL are still under development. In this study, the applicability of metallic materials, such as Ni, Co, Ir, W, and Ta, as the absorber in a binary-intensity BEUVL mask was evaluated. The mask-imaging properties were simulated by adopting a thickness that ensured a reflectivity of <1% for each material. Furthermore, we used a multilayered La/B mirror--which exhibited a high reflectivity at a wavelength of 6.7 nm--because BEUV light is absorbed by most materials, and therefore uses reflective optics as desired. The numerical aperture (NA), angle of incidence, and demagnification factor were 0.5 and 0.6, 6 degrees, and 8x, respectively. We confirmed that a line-and-space pattern with a half-pitch of 11 nm can be patterned with metallic absorbers by using a high NA.

  17. High intensity vacuum ultraviolet and extreme ultraviolet production by noncollinear mixing in laser vaporized media

    NASA Astrophysics Data System (ADS)

    Todt, Michael A.; Albert, Daniel R.; Davis, H. Floyd

    2016-06-01

    A method is described for generating intense pulsed vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) laser radiation by resonance enhanced four-wave mixing of commercial pulsed nanosecond lasers in laser vaporized mercury under windowless conditions. By employing noncollinear mixing of the input beams, the need of dispersive elements such as gratings for separating the VUV/XUV from the residual UV and visible beams is eliminated. A number of schemes are described, facilitating access to the 9.9-14.6 eV range. A simple and convenient scheme for generating wavelengths of 125 nm, 112 nm, and 104 nm (10 eV, 11 eV, and 12 eV) using two dye lasers without the need for dye changes is described.

  18. Extreme- and far-ultraviolet environment at shuttle altitudes

    SciTech Connect

    Chakrabarti, S.

    1987-01-01

    The astronomical data obtained by the Far Ultraviolet Space Telescope (FAUST) and the Very Wide Field Camera (VWFC) on board the Spacelab I mission have triggered questions on the natural and induced Extreme and Far Ultraviolet (EUV and FUV) environment of the space shuttle. Moreover, the recent discovery of approx. lk Rayleighs N/sub 2/ Lyman Birge Hopfield (LBH) nightglow emissions by the U.S. Air Force's S3-4 satellite, and subsequent confirmation by the Imaging Spectrometric Observatory (ISO) experiment on the Spacelab I mission have serious implications for the astronomical observations from the shuttle. Since both ISO and S3-4 experiments were conducted from shuttle altitudes, the implied EUV and FUV environment for astronomical observations can be severe. In order to address the question of the suitability of the shuttle as an astronomical platform, data from FAUST and other experiments were examined. It is concluded that the FAUST background is most likely due to the observation of tropical UV arcs, a natural airglow phenomenon. Strategies for future shuttle experiments to overcome this and other natural emissions are discussed.

  19. Toward defect-free fabrication of extreme ultraviolet photomasks

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed H.; Lawliss, Mark; Badger, Karen D.; Turley, Christina

    2016-04-01

    Defect-free fabrication of extreme ultraviolet (EUV) masks relies on the appropriate detection of native defects and subsequent strategies for their elimination. Commercial unavailability of actinic mask-blank inspection systems motivates the identification of an optical inspection methodology most suitable for finding relevant EUV blank defects. Studies showed that 193-nm wavelength inspection found the greatest number of printable defects as compared with rival higher-wavelength systems, establishing deep ultraviolet inspections as the blank defectivity baseline for subsequent mitigation strategies. Next, defect avoidance via pattern shifting was explored using representative 7-nm node metal/contact layer designs and 193-nm mask-blank inspection results. It was found that a significant percentage of native defects could be avoided only when the design was limited to active patterns (i.e., layouts without dummy fill). Total pattern-defect overlap remained ≤5 when metal layer blanks were chosen from the top 35% least defective substrates, while the majority of blanks remained suitable for contacts layers due to a lower active pattern density. Finally, nanomachining was used to address remaining native/multilayer defects. Native catastrophic defects were shown to recover 40% to 70% of target critical dimension after nanomachining, demonstrating the enormous potential for compensating multilayer defects.

  20. Method for the protection of extreme ultraviolet lithography optics

    DOEpatents

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  1. Extreme ultraviolet observations from voyager 1 encounter with jupiter.

    PubMed

    Broadfoot, A L; Belton, M J; Takacs, P Z; Sandel, B R; Shemansky, D E; Holberg, J B; Ajello, J M; Atreya, S K; Donahue, T M; Moos, H W; Bertaux, J L; Blamont, J E; Strobel, D F; McConnell, J C; Dalgarno, A; Goody, R; McElroy, M B

    1979-06-01

    Observations of the optical extreme ultraviolet spectrum of the Jupiter planetary system during the Voyager 1 encounter have revealed previously undetected physical processes of significant proportions. Bright emission lines of S III, S IV, and O III indicating an electron temperature of 10(5) K have been identified in preliminary analyses of the Io plasma torus spectrum. Strong auroral atomic and molecular hydrogen emissions have been observed in the polar regions of Jupiter near magnetic field lines that map the torus into the atmosphere of Jupiter. The observed resonance scattering of solar hydrogen Lyman alpha by the atmosphere of Jupiter and the solar occultation experiment suggest a hot thermosphere (>/= 1000 K) wvith a large atomic hydrogen abundance. A stellar occultation by Ganymede indicates that its atmosphere is at most an exosphere.

  2. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT

    SciTech Connect

    Zhang, X. L.; Cheng, Z. F. Hou, S. Y.; Zhuang, G.; Luo, J.

    2014-11-15

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  3. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    PubMed Central

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  4. THE EXTREME-ULTRAVIOLET EMISSION FROM SUN-GRAZING COMETS

    SciTech Connect

    Bryans, P.; Pesnell, W. D.

    2012-11-20

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  5. Extreme Ultraviolet Multilayer Defect Compensation in Computational Lithography.

    PubMed

    Kim, Sang-Kon

    2016-05-01

    For the extreme ultraviolet (EUV) lithography, multilayer (ML) defects such as bump and pit defects can disrupt the phase of reflected field and degrade aerial images on wafer. In this paper, a defect printability and repair simulator (DPRS) is introduced to predict and repair the effect of ML defects in EUV aerial images. DPRS is composed of multilayer growth by using Gaussian function and Stearns's method, mask simulation by using a scattering matrix (S-matrix) analysis method, and projection simulation by using Köhler's illumination. For bump and pit ML defects, the combining the modified absorber and the layer-by-layer ML peeling is better than other methods. This study can be helpful in understanding EUV defect and also give insight into the EUV defect compensation for the device volume production. PMID:27483941

  6. Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb.

    PubMed

    Zhang, Bosheng; Gardner, Dennis F; Seaberg, Matthew H; Shanblatt, Elisabeth R; Porter, Christina L; Karl, Robert; Mancuso, Christopher A; Kapteyn, Henry C; Murnane, Margaret M; Adams, Daniel E

    2016-08-01

    We report a proof-of-principle demonstration of a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. This scheme is enabled by combining ptychographic information multiplexing (PIM) with a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and a more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both microscopy and spectroscopy aspects. In addition to spectromicroscopy, this method images the multicolor EUV beam in situ, making this a powerful beam characterization technique. In contrast to other methods, the techniques described here use no hardware to separate wavelengths, leading to efficient use of the EUV radiation. PMID:27505837

  7. Extreme ultraviolet induced defects on few-layer graphene

    SciTech Connect

    Gao, A.; Zoethout, E.; Lee, C. J.; Rizo, P. J.; Scaccabarozzi, L.; Banine, V.; Bijkerk, F.

    2013-07-28

    We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e., relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H{sub 2} background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy results show that the sp{sup 2} bonded carbon fraction decreases while the sp{sup 3} bonded carbon and oxide fraction increases with exposure dose. Our experimental results confirm that even in reducing environment oxidation is still one of the main source of inducing defects.

  8. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    PubMed

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  9. Broadband extreme ultraviolet probing of transient gratings in vanadium dioxide.

    PubMed

    Sistrunk, Emily; Grilj, Jakob; Jeong, Jaewoo; Samant, Mahesh G; Gray, Alexander X; Dürr, Hermann A; Parkin, Stuart S P; Gühr, Markus

    2015-02-23

    Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). We demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO(2) film with EUV diffraction from the optically excited sample. The VO(2) exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separate the two features. PMID:25836470

  10. Ptychographic hyperspectral spectromicroscopy with an extreme ultraviolet high harmonic comb

    NASA Astrophysics Data System (ADS)

    Zhang, Bosheng; Gardner, Dennis F.; Seaberg, Matthew H.; Shanblatt, Elisabeth R.; Porter, Christina L.; Karl, Robert; Mancuso, Christopher A.; Kapteyn, Henry C.; Murnane, Margaret M.; Adams, Daniel E.

    2016-08-01

    We demonstrate a new scheme of spectromicroscopy in the extreme ultraviolet (EUV) spectral range, where the spectral response of the sample at different wavelengths is imaged simultaneously. It is enabled by applying ptychographical information multiplexing (PIM) to a tabletop EUV source based on high harmonic generation, where four spectrally narrow harmonics near 30 nm form a spectral comb structure. Extending PIM from previously demonstrated visible wavelengths to the EUV/X-ray wavelengths promises much higher spatial resolution and more powerful spectral contrast mechanism, making PIM an attractive spectromicroscopy method in both the microscopy and the spectroscopy aspects. Besides the sample, the multicolor EUV beam is also imaged in situ, making our method a powerful beam characterization technique. No hardware is used to separate or narrow down the wavelengths, leading to efficient use of the EUV radiation.

  11. Ultrafast Extreme Ultraviolet Absorption Spectroscopy of Methylammonium Lead Iodide Perovskite

    NASA Astrophysics Data System (ADS)

    Verkamp, Max A.; Lin, Ming-Fu; Ryland, Elizabeth S.; Vura-Weis, Josh

    2016-06-01

    Methylammonium lead iodide (perovskite) is a leading candidate for use in next-generation solar cell devices. However, the photophysics responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) absorption was used to investigate electron and hole dynamics in perovskite by observing transitions from a common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation with a broad spectrum (40-70 eV) were generated via high-harmonic generation using a tabletop instrument. Transient absorption measurements with visible pump and XUV probe directly observed the relaxation of charge carriers in perovskite after above-band excitation in the femtosecond and picosecond time ranges.

  12. Electron impact excitation of argon in the extreme vacuum ultraviolet

    NASA Technical Reports Server (NTRS)

    Mentall, J. E.; Morgan, H. D.

    1976-01-01

    Polarization-free excitation cross sections in the extreme vacuum ultraviolet have been measured for electron impact on Ar. Observed spectral features were those lines of Ar I and Ar II which lie between 700 and 1100 A. Excitation functions were measured for the Ar I resonance line at 1048 A and the Ar II resonance line at 920 A. Peak cross sections for these two lines were found to be (39.4 plus or minus 7.9) x 10 to the -18th and (6.9 plus or minus 1.4) x 10 to the -18th, respectively. At low energies, excitation of the Ar II resonance line is dominated by an electron exchange transition.

  13. Extreme ultraviolet spectrograph ATM experiment S082B.

    PubMed

    Bartoe, J D; Brueckner, G E; Purcell, J D; Tousey, R

    1977-04-01

    The extreme ultraviolet, double-dispersion, photographic spectrograph, Apollo Telescope Mount (ATM) Experiment S082B on Skylab is described. Novel features were the use of a predisperser grating with a ruling whose spacing varied approximately linearly with distance for the purpose of increasing the instrument speed by reducing the astigmatism and a photoelectric servo-system to stabilize to 1 sec of arc the solar image at various near-limb positions. The 970-3940-A range was covered in two sections with effective lambda/Deltalambda congruent with 30,000 from 1100 A to 1970 A. The spatial resolution was 2 x 60 solar sec of arc. During the Skylab mission 6400 exposures were made with the instrument pointed by an astronaut at selected and recorded'solar positions.

  14. The Extreme-ultraviolet Emission from Sun-grazing Comets

    NASA Technical Reports Server (NTRS)

    Bryans, Paul; Pesnell, William D.

    2012-01-01

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses.We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  15. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    PubMed

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  16. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  17. Normal incidence multilayer mirrors for extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Stern, R. A.; Haisch, B. M.; Joki, E. G.; Catura, R. C.

    1984-01-01

    Sputtered multilayer coatings allow the use of normal incidence optics in the extreme ultraviolet (EUV) region below 500 A. Multilayer mirrors can be tailored to provide images at strong EUV lines in the sun and stars, in many cases making more efficient use of the telescope aperture than grazing incidence optics. Alternatively, the bandpass can be broadened at the expense of peak effective area, by varying the multilayer structure over the mirror surface. Such mirrors can also serve as optical elements in spectrographs for investigation of specific emission and absorption line complexes, and are self-filtering in that they reject nearby geocoronal and cosmic resonance line backgrounds. Current efforts at the Lockheed Palo Alto Research Laboratory in the design, fabrication, and testing of EUV multilayer mirrors are discussed. This program includes the design and fabrication of normal incidence EUV multilayer mirrors, and the deposition of multilayers on lacquer-coated substrates.

  18. Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

    NASA Astrophysics Data System (ADS)

    Schmitz, Christoph; Wilson, Daniel; Rudolf, Denis; Wiemann, Carsten; Plucinski, Lukasz; Riess, Sally; Schuck, Martin; Hardtdegen, Hilde; Schneider, Claus M.; Tautz, F. Stefan; Juschkin, Larissa

    2016-06-01

    We report on the combination of a state-of-the-art energy-filtering photoemission electron microscope with an intense yet compact laboratory-based gas discharge extreme ultraviolet (EUV) light source. Using a photon energy of 71.7 eV from oxygen plasma (O5+ spectral line), we demonstrate element-selective photoelectron imaging in real space and band structure mapping in reciprocal space. Additionally, the high surface sensitivity of the EUV light was used to study the surface oxidation on islands of the phase-change material Ge1Sb2Te4 . The EUV light source allows the extension of spectromicroscopy, previously only feasible at synchrotron beamlines, to laboratory-based work.

  19. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y.; Rudenko, Artem; Herrwerth, O.; Foucar, L.; Kurka, M.; Kuhnel, K.; Lezius, M.; Kling, Matthias; van Tilborg, Jeroen; Belkacem, Ali; Ueda, K.; Dusterer, S.; Treusch, R.; Schroter, Claus-Dieter; Moshammer, Robbert; Ullrich, Joachim

    2011-06-17

    Ultrafast isomerization of acetylene cations ([HC = CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +} + CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52 {+-} 15 fs in a kinetic energy release (KER) window of 5.8 < KER < 8 eV, providing clear evidence for the existence of a fast, nonradiative decay channel.

  20. Plans for the extreme ultraviolet explorer data base

    NASA Technical Reports Server (NTRS)

    Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

    1988-01-01

    The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

  1. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    NASA Astrophysics Data System (ADS)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  2. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y. H.; Kurka, M.; Kuehnel, K. U.; Schroeter, C. D.; Moshammer, R.; Rudenko, A.; Foucar, L.; Herrwerth, O.; Lezius, M.; Kling, M. F.; Tilborg, J. van; Belkacem, A.; Ueda, K.; Duesterer, S.; Treusch, R.; Ullrich, J.

    2010-12-31

    Ultrafast isomerization of acetylene cations ([HC=CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +}+CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52{+-}15 fs in a kinetic energy release (KER) window of 5.8

  3. Extreme ultraviolet spectra of highly ionized oxygen and fluorine

    NASA Technical Reports Server (NTRS)

    Pegg, D. J.; Griffin, P. M.; Haselton, H. H.; Laubert, R.; Mowat, J. R.; Thoe, R. S.; Peterson, R. S.; Sellin, I. A.

    1974-01-01

    The foil-excitation method has been used to study the extreme ultraviolet spectra of highly ionized oxygen and fluorine. Several previously unreported lines in heliumlike fluorine are reported and other newly reported lines in heliumlike oxygen have been measured to higher accuracy. Included in the measurements are certain heliumlike oxygen transitions of significance in interpretation of solar-flare spectral observations. The wavelength determinations are usually in good agreement with calculated results which includes relativistic corrections, but discrepancies arise when nonrelativistic calculations are used. A comparison of the present results and those recently obtained by theta-pinch and laser-induced plasma sources is made for both heliumlike and lithiumlike ions; a few discrepancies occur, with results in most cases in better agreement with relativistically corrected calculations. Certain unidentified lines in the spectra may be attributable to radiative transitions between quartet states of lithiumlike ions.

  4. Low-defect reflective mask blanks for extreme ultraviolet lithography

    SciTech Connect

    Burkhart, S C; Cerjarn, C; Kearney, P; Mirkarimi, P; Walton, C; Ray-Chaudhuri, A

    1999-03-11

    Extreme Ultraviolet Lithgraphy (EUVL) is an emerging technology for fabrication of sub-100 nm feature sizes on silicon, following the SIA roadmap well into the 21st century. The specific EUVL system described is a scanned, projection lithography system with a 4:1 reduction, using a laser plasma EUV source. The mask and all of the system optics are reflective, multilayer mirrors which function in the extreme ultraviolet at 13.4 nm wavelength. Since the masks are imaged to the wafer exposure plane, mask defects greater than 80% of the exposure plane CD (for 4:1 reduction) will in many cases render the mask useless, whereas intervening optics can have defects which are not a printing problem. For the 100 nm node, we must reduce defects to less than 0.01/cm² @ 80nm or larger to obtain acceptable mask production yields. We have succeeded in reducing the defects to less than 0.1/cm² for defects larger than 130 nm detected by visible light inspection tools, however our program goal is to achieve 0.01/cm² in the near future. More importantly though, we plan to have a detailed understanding of defect origination and the effect on multilayer growth in order to mitigate defects below the 10-2/cm² level on the next generation of mask blank deposition systems. In this paper we will discuss issues and results from the ion-beam multilayer deposition tool, details of the defect detection and characterization facility, and progress on defect printability modeling.

  5. Operation of a free-electron laser from the extreme ultraviolet to the water window

    NASA Astrophysics Data System (ADS)

    Ackermann, W.; Asova, G.; Ayvazyan, V.; Azima, A.; Baboi, N.; Bähr, J.; Balandin, V.; Beutner, B.; Brandt, A.; Bolzmann, A.; Brinkmann, R.; Brovko, O. I.; Castellano, M.; Castro, P.; Catani, L.; Chiadroni, E.; Choroba, S.; Cianchi, A.; Costello, J. T.; Cubaynes, D.; Dardis, J.; Decking, W.; Delsim-Hashemi, H.; Delserieys, A.; di Pirro, G.; Dohlus, M.; Düsterer, S.; Eckhardt, A.; Edwards, H. T.; Faatz, B.; Feldhaus, J.; Flöttmann, K.; Frisch, J.; Fröhlich, L.; Garvey, T.; Gensch, U.; Gerth, Ch.; Görler, M.; Golubeva, N.; Grabosch, H.-J.; Grecki, M.; Grimm, O.; Hacker, K.; Hahn, U.; Han, J. H.; Honkavaara, K.; Hott, T.; Hüning, M.; Ivanisenko, Y.; Jaeschke, E.; Jalmuzna, W.; Jezynski, T.; Kammering, R.; Katalev, V.; Kavanagh, K.; Kennedy, E. T.; Khodyachykh, S.; Klose, K.; Kocharyan, V.; Körfer, M.; Kollewe, M.; Koprek, W.; Korepanov, S.; Kostin, D.; Krassilnikov, M.; Kube, G.; Kuhlmann, M.; Lewis, C. L. S.; Lilje, L.; Limberg, T.; Lipka, D.; Löhl, F.; Luna, H.; Luong, M.; Martins, M.; Meyer, M.; Michelato, P.; Miltchev, V.; Möller, W. D.; Monaco, L.; Müller, W. F. O.; Napieralski, O.; Napoly, O.; Nicolosi, P.; Nölle, D.; Nuñez, T.; Oppelt, A.; Pagani, C.; Paparella, R.; Pchalek, N.; Pedregosa-Gutierrez, J.; Petersen, B.; Petrosyan, B.; Petrosyan, G.; Petrosyan, L.; Pflüger, J.; Plönjes, E.; Poletto, L.; Pozniak, K.; Prat, E.; Proch, D.; Pucyk, P.; Radcliffe, P.; Redlin, H.; Rehlich, K.; Richter, M.; Roehrs, M.; Roensch, J.; Romaniuk, R.; Ross, M.; Rossbach, J.; Rybnikov, V.; Sachwitz, M.; Saldin, E. L.; Sandner, W.; Schlarb, H.; Schmidt, B.; Schmitz, M.; Schmüser, P.; Schneider, J. R.; Schneidmiller, E. A.; Schnepp, S.; Schreiber, S.; Seidel, M.; Sertore, D.; Shabunov, A. V.; Simon, C.; Simrock, S.; Sombrowski, E.; Sorokin, A. A.; Spanknebel, P.; Spesyvtsev, R.; Staykov, L.; Steffen, B.; Stephan, F.; Stulle, F.; Thom, H.; Tiedtke, K.; Tischer, M.; Toleikis, S.; Treusch, R.; Trines, D.; Tsakov, I.; Vogel, E.; Weiland, T.; Weise, H.; Wellhöfer, M.; Wendt, M.; Will, I.; Winter, A.; Wittenburg, K.; Wurth, W.; Yeates, P.; Yurkov, M. V.; Zagorodnov, I.; Zapfe, K.

    2007-06-01

    We report results on the performance of a free-electron laser operating at a wavelength of 13.7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source have been measured. In the saturation regime, the peak energy approached 170 µJ for individual pulses, and the average energy per pulse reached 70 µJ. The pulse duration was in the region of 10 fs, and peak powers of 10 GW were achieved. At a pulse repetition frequency of 700 pulses per second, the average extreme-ultraviolet power reached 20 mW. The output beam also contained a significant contribution from odd harmonics of approximately 0.6% and 0.03% for the 3rd (4.6 nm) and the 5th (2.75 nm) harmonics, respectively. At 2.75 nm the 5th harmonic of the radiation reaches deep into the water window, a wavelength range that is crucially important for the investigation of biological samples.

  6. Operation of a Free-Electron Laser from the Extreme Ultraviolet to the Water Window

    SciTech Connect

    Ackermann, W.; Asova, G.; Ayvazyan, V.; Azima, A.; Baboi, N.; Bahr, J.; Balandin, V.; Beutner, B.; Brandt, A.; Bolzmann, A.; Brinkmann, R.; Brovko, O.I.; Castellano, M.; Castro, P.; Catani, L.; Chiadroni, E.; Choroba, S.; Cianchi, A.; Costello, J.T.; Cubaynes, D.; Dardis, J.; /Dublin City U. /DESY /Hamburg U. /Queen's U., Belfast /Frascati /DESY /DESY /Hamburg U. /Fermilab /DESY /DESY /DESY /SLAC /Hamburg U. /Orsay, LAL /DESY, Zeuthen /DESY /DESY /DESY /DESY, Zeuthen /Lodz, Tech. U. /DESY /DESY /Hamburg U. /DESY /DESY /Hamburg U. /DESY /DESY /Kharkov Natl. U. /BESSY, Berlin /Warsaw U. of Tech. /Lodz, Tech. U. /DESY /DESY /Dublin City U. /Dublin City U. /DESY, Zeuthen /DESY, Zeuthen /DESY /DESY /DESY /Warsaw U. of Tech. /DESY, Zeuthen /DESY /DESY, Zeuthen /DESY /DESY /Queen's U., Belfast /DESY /DESY /DESY /Hamburg U. /Dublin City U. /Saclay /Hamburg U. /Orsay, IPN /LASA, Segrate /Hamburg U. /DESY /LASA, Segrate /Darmstadt, Tech. Hochsch. /Lodz, Tech. U. /Saclay /Padua U. /DESY /DESY /DESY, Zeuthen /LASA, Segrate /Saclay /DESY /Hamburg U. /Dublin City U. /DESY /DESY, Zeuthen /DESY /DESY /DESY /DESY /DESY, Zeuthen /Warsaw U. of Tech. /DESY /Hamburg U. /DESY /Warsaw U. of Tech. /DESY /DESY /DESY /Berlin, Phys. Tech. Bund. /DESY /Hamburg U. /Hamburg U. /Warsaw U. of Tech. /SLAC /Hamburg U. /DESY /DESY, Zeuthen /DESY /Max Born Inst., Berlin /DESY /DESY /DESY /Hamburg U. /DESY /DESY /Darmstadt, Tech. Hochsch. /DESY /DESY /PSI, Villigen /LASA, Segrate /Dubna, JINR /Saclay /DESY /DESY /Ioffe Phys. Tech. Inst. /Berlin, Phys. Tech. Bund. /Humboldt U., Berlin /Kharkov Natl. U. /DESY, Zeuthen /DESY /DESY, Zeuthen /DESY /DESY /DESY /DESY /DESY /DESY /DESY /Sofiya, Inst. Nucl. Res. /DESY /Darmstadt, Tech. Hochsch. /DESY /Hamburg U. /DESY /Fermilab /Max Born Inst., Berlin /DESY /DESY /Hamburg U. /Dublin City U. /DESY /DESY /DESY

    2007-12-17

    We report results on the performance of a free-electron laser operating at a wavelength of 13.7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source have been measured. In the saturation regime, the peak energy approached 170 {micro}J for individual pulses, and the average energy per pulse reached 70 {micro}J. The pulse duration was in the region of 10 fs, and peak powers of 10 GW were achieved. At a pulse repetition frequency of 700 pulses per second, the average extreme-ultraviolet power reached 20mW. The output beam also contained a significant contribution from odd harmonics of approximately 0.6% and 0.03% for the 3rd (4.6 nm) and the 5th (2.75 nm) harmonics, respectively. At 2.75 nm the 5th harmonic of the radiation reaches deep into the water window, a wavelength range that is crucially important for the investigation of biological samples.

  7. Recording oscillations of sub-micron size cantilevers by extreme ultraviolet Fourier transform holography.

    PubMed

    Monserud, Nils C; Malm, Erik B; Wachulak, Przemyslaw W; Putkaradze, Vakhtang; Balakrishnan, Ganesh; Chao, Weilun; Anderson, Erik; Carlton, David; Marconi, Mario C

    2014-02-24

    We recorded the fast oscillation of sub-micron cantilevers using time-resolved extreme ultraviolet (EUV) Fourier transform holography. A tabletop capillary discharge EUV laser with a wavelength of 46.9 nm provided a large flux of coherent illumination that was split using a Fresnel zone plate to generate the object and the reference beams. The reference wave was produced by the first order focus while a central opening in the zone plate provided a direct illumination of the cantilevers. Single-shot holograms allowed for the composition of a movie featuring the fast oscillation. Three-dimensional displacements of the object were determined as well by numerical back-propagation, or "refocusing" of the electromagnetic fields during the reconstruction of a single hologram. PMID:24663740

  8. Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

    SciTech Connect

    Fuchs, S.; Roedel, C.; Bierbach, J.; Paz, A. E.; Foerster, E.; Paulus, G. G.; Krebs, M.; Haedrich, S.; Limpert, J.; Kuschel, S.; Wuensche, M.; Hilbert, V.; Zastrau, U.

    2013-02-15

    We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 {mu}W and {mu}J per harmonic using the respective generation mechanisms.

  9. Graphene defect formation by extreme ultraviolet generated photoelectrons

    SciTech Connect

    Gao, A. Lee, C. J.; Bijkerk, F.

    2014-08-07

    We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy lower than 80 eV. After e-beam irradiation, it is found that the D peak, I(D), appears in the Raman spectrum, indicating defect formation in graphene. The evolution of I(D)/I(G) follows the amorphization trajectory with increasing irradiation dose, indicating that graphene goes through a transformation from microcrystalline to nanocrystalline and then further to amorphous carbon. Further, irradiation of graphene with increased water partial pressure does not significantly change the Raman spectra, which suggests that, in the extremely low energy range, e-beam induced chemical reactions between residual water and graphene are not the dominant mechanism driving defect formation in graphene. Single layer graphene, partially suspended over holes was irradiated with EUV radiation. By comparing with the Raman results from e-beam irradiation, it is concluded that the photoelectrons, especially those from the valence band, contribute to defect formation in graphene during irradiation.

  10. Computation of reflected images from extreme ultraviolet masks

    NASA Astrophysics Data System (ADS)

    Bollepalli, Srinivas B.; Cerrina, Franco

    1999-06-01

    With EUV lithography emerging as a promising technology for semiconductor device fabrication with critical dimensions extreme ultra violet mask. In particular, we show the effects caused due to diffraction, non-uniformities in the multilayer stack due to substrate defects, and partial spatial coherence. Several simulation examples are presented.

  11. An operations and command systems for the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Muscettola, Nicola; Korsmeyer, David J.; Olson, Eric C.; Wong, Gary

    1994-01-01

    About 40% of the budget of a scientific spacecraft mission is usually consumed by Mission Operations & Data Analysis (MO&DA) with MO driving these costs. In the current practice, MO is separated from spacecraft design and comes in focus relatively late in the mission life cycle. As a result, spacecraft may be designed that are very difficult to operate. NASA centers have extensive MO expertise but often lessons learned in one mission are not exploited for other parallel or future missions. A significant reduction of MO costs is essential to ensure a continuing and growing access to space for the scientific community. We are addressing some of these issues with a highly automated payload operations and command system for an existing mission, the Extreme Ultraviolet Explorer (EUVE). EUVE is currently operated jointly by the Goddard Space Flight Center (GSFC), responsible for spacecraft operations, and the Center for Extreme Ultraviolet Astrophysics (CEA) of the University of California, Berkeley, which controls the telescopes and scientific instruments aboard the satellite. The new automated system is being developed by a team including personnel from the NASA Ames Research Center (ARC), the Jet Propulsion Laboratory (JPL) and the Center for EUV Astrophysics (CEA). An important goal of the project is to provide AI-based technology that can be easily operated by nonspecialists in AI. Another important goal is the reusability of the techniques for other missions. Models of the EUVE spacecraft need to be built both for planning/scheduling and for monitoring. In both cases, our modeling tools allow the assembly of a spacecraft model from separate sub-models of the various spacecraft subsystems. These sub-models are reusable; therefore, building mission operations systems for another small satellite mission will require choosing pre-existing modules, reparametrizing them with respect to the actual satellite telemetry information, and reassembling them in a new model. We

  12. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Huang, Jianping; Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo

    2016-07-01

    Following the extreme solar minimum during 2008-2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, using observations from Earth-orbiting satellites, we compare the solar extreme ultraviolet (EUV) irradiance between SC23 and SC24 and investigate the solar cycle change of linear dependence of EUV on the P ((F10.7 + F10.7A)/2) and Mg II core-to-wing ratio indices. The Bremen composite Mg II index is strongly correlated with P over the two solar cycles, while this is not the case for the Laboratory for Atmospheric and Space Physics (LASP) composite Mg II index, so we focus on the different dependence of EUV on the P and LASP Mg II indices. As a result we find that three coronal emissions (Fe XV at 28.4 nm and 41.7 nm and Fe XVI at 33.5 nm) brighten in SC24 relative to P; i.e., the magnitude of irradiance is higher than in SC23 at the same level of P. But relative to the LASP Mg II index, these emissions show no appreciable solar cycle differences. By contrast, the H I Lyman α at 121.6 nm dims in SC24 relative to the LASP Mg II but shows identical dependence on P in the two solar cycles. This result seems to contradict a well-accepted fact that chromospheric and transition region emissions are better represented by the Mg II index and coronal lines by F10.7. For the different solar cycle variability of EUV in SC24, whether it is caused by source changes on the Sun is still unclear, but we suggest that it needs to be considered in proxy modeling of the EUV irradiance and aeronomic studies.

  13. The joint astrophysical plasmadynamic experiment extreme ultraviolet spectrometer: resolving power

    NASA Astrophysics Data System (ADS)

    Berendse, F. B.; Cruddace, R. G.; Kowalski, M. P.; Yentis, D. J.; Hunter, W. R.; Fritz, G. G.; Siegmund, O.; Heidemann, K.; Lenke, R.; Seifert, A.; Barbee, T. W., Jr.

    2006-06-01

    The Joint astrophysical Plasmadynamic EXperiment (J-PEX) is a high-resolution extreme ultraviolet (EUV) spectrometer (220-245 Å) used for the study of white dwarf atmospheres. Significant improvements have been achieved in both the normal-incidence gratings and the focal-plane detector since its first successful sounding rocket flight in 2001. The spherical laminar gratings have been replaced by paraboloidal gratings. The substrates of the new gratings have measured slope errors less than 0.35 arcsec. The gratings were recorded holographically and the rulings transferred into the silica substrates by ion etching. This procedure was followed by polymer overcoat to reduce the blaze angle of the groove profile. The detector uses microchannel plates with 6 μm pores and a cross-strip anode, providing 17.9 μm resolution in the dispersion direction. The detector employs a KBr photocathode with a projected efficiency of 0.24 at 256 Å. Using ray tracing simulations, we predict the resolving power expected from the spectrometer during upcoming EUV calibrations with a He II discharge source.

  14. Low extreme-ultraviolet luminosities impinging on protoplanetary disks

    SciTech Connect

    Pascucci, I.; Hendler, N. P.; Ricci, L.; Gorti, U.; Hollenbach, D.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (∼2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 10{sup 42} photons s{sup –1} for all sources without jets and lower than 5 × 10{sup 40} photons s{sup –1} for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  15. Laser produced plasma for efficient extreme ultraviolet light sources

    SciTech Connect

    Donnelly, Tony; Cummins, Thomas; O' Gorman, Colm; Li Bowen; Harte, Colm S.; O'Reilly, Fergal; Sokell, Emma; Dunne, Padraig; O'Sullivan, Gerry

    2012-05-25

    Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO{sub 2} laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO{sub 2} laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd{sub 2}O{sub 3} target has been performed and verified.

  16. Automated detection of oscillations in extreme ultraviolet imaging data

    NASA Astrophysics Data System (ADS)

    Ireland, J.; Marsh, M. S.; Kucera, T. A.; Young, C. A.

    2008-12-01

    The corona is now known to support many different types of oscillation. Initial detection of these oscillations currently relied on manual labor. With the advent of much higher cadence EUV (extreme ultraviolet) data at better spatial resolution, sifting through the data manually to look for oscillatory material becomes an onerous task. Further, different observers tend to see different behavior in the data. To overcome these problems, we introduce a Bayesian probability-based automated method to detect areas in EUV images that support oscillations. The method is fast and can handle time series data with even or uneven cadences. Interestingly, the Bayesian approach allows us to generate a probability that a given frequency is present without the need for an estimate of the noise in the data. We also generate simple and intuitive "quality measures" for each detected oscillation. This will allow users to select the "best" examples in a given dataset automatically. The method is demonstrated on existing datasets (EIT, TRACE, STEREO). Its application to Solar Dynamics Observatory data is also discussed. We also discuss some of the problems in detecting oscillations in the presence of a significant background trend which can pollute the frequency spectrum.

  17. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    NASA Technical Reports Server (NTRS)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  18. AN EXTREME-ULTRAVIOLET WAVE ASSOCIATED WITH A SURGE

    SciTech Connect

    Zheng, Ruisheng; Jiang, Yunchun; Yang, Jiayan; Bi, Yi; Hong, Junchao; Yang, Bo; Yang, Dan

    2013-02-10

    Taking advantage of the high temporal and spatial resolution observations from the Solar Dynamics Observatory, we present an extreme-ultraviolet (EUV) wave associated with a surge on 2010 November 13. Due to the magnetic flux cancelation, some surges formed in the source active region (AR). The strongest surge produced our studied event. The surge was deflected by the nearby loops that connected to another AR, and disrupted the overlying loops that slowly expanded and eventually evolved into a weak coronal mass ejection (CME). The surge was likely associated with the core of the CME. The EUV wave happened after the surge deflected. The wave departed far from the flare center and showed a close location relative to the deflected surge. The wave propagated in a narrow angular extent, mainly in the ejection direction of the surge. The close timing and location relations between the EUV wave and the surge indicate that the wave was closely associated with the CME. The wave had a velocity of 310-350 km s{sup -1}, while the speeds of the surge and the expanding loops were about 130 and 150 km s{sup -1}, respectively. All of the results suggest that the EUV wave was a fast-mode wave and was most likely triggered by the weak CME.

  19. Kr photoionized plasma induced by intense extreme ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

    2016-04-01

    Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

  20. Thermal{endash}mechanical performance of extreme ultraviolet lithographic reticles

    SciTech Connect

    Gianoulakis, S.E.; Ray-Chaudhuri, A.K.

    1998-11-01

    Thermal deformation of reticles will likely become an important consideration for all advanced lithography techniques targeting 130 nm features and below. Such effects can contribute to image placement errors and blur. These issues necessitate the need to quantify the reticle distortion, induced by the absorption of illumination power, for candidate substrate and coating materials. To study the impact of various substrate and coating materials on reticle performance, detailed three-dimensional transient thermal and solid mechanical models have been developed and extensively applied to predict total placement errors, residual placement errors, and blur on an extreme ultraviolet lithography (EUVL) reticle during scanning. The thermal model includes a bidirectional scanning heat source representative of the illumination incident on the reticle. The heat loads on the reticle are characteristic of an EUVL engineering test stand with a wafer throughput of twenty 200 mm wafers per hour (assuming 80{percent} die coverage and 68{percent} exposure time). This article includes the results which describe the impact of (1) different substrate materials, (2) various degrees of contact conductance between the reticle and chuck, (3) pattern density and arrangement, and (4) temperature variations across the chuck. {copyright} {ital 1998 American Vacuum Society.}

  1. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  2. Extreme ultraviolet spectrometer for the Shenguang III laser facility.

    PubMed

    Xiong, Gang; Yang, Guohong; Zhang, Jiyan; Wei, Minxi; Zhao, Yang; Qing, Bo; Lv, Min; Yang, Zhenghua; Wang, Feng; Liu, Shenye; Cai, Houzhi; Liu, Jinyuan

    2015-06-10

    An extreme ultraviolet spectrometer has been developed for high-energy density physics experiments at the Shenguang-III (SG-III) laser facility. Alternative use of two different varied-line-spacing gratings covers a wavelength range of 10-260 Å. A newly developed x-ray framing camera with single wide strip line is designed to record time-gated spectra with ~70 ps temporal resolution and 20 lp/mm spatial resolution. The width of the strip line is up to 20 mm, enhancing the capability of the spatial resolving measurements. All components of the x-ray framing camera are roomed in an aluminum air box. The whole spectrometer is mounted on a diagnostic instrument manipulator at the SG-III laser facility for the first time. A new alignment method for the spectrometer based on the superimposition of two laser focal spots is developed. The approaches of the alignment including offline and online two steps are described. A carbon spectrum and an aluminum spectrum have been successfully recorded by the spectrometer using 2400 l/mm and 1200 l/mm gratings, respectively. The experimental spectral lines show that the spectral resolution of the spectrometer is about 0.2 Å and 1 Å for the 2400 l/mm and 1200 l/mm gratings, respectively. A theoretical calculation was carried out to estimate the maximum resolving power of the spectrometer.

  3. An Extreme-ultraviolet Wave Associated with a Surge

    NASA Astrophysics Data System (ADS)

    Zheng, Ruisheng; Jiang, Yunchun; Yang, Jiayan; Bi, Yi; Hong, Junchao; Yang, Bo; Yang, Dan

    2013-02-01

    Taking advantage of the high temporal and spatial resolution observations from the Solar Dynamics Observatory, we present an extreme-ultraviolet (EUV) wave associated with a surge on 2010 November 13. Due to the magnetic flux cancelation, some surges formed in the source active region (AR). The strongest surge produced our studied event. The surge was deflected by the nearby loops that connected to another AR, and disrupted the overlying loops that slowly expanded and eventually evolved into a weak coronal mass ejection (CME). The surge was likely associated with the core of the CME. The EUV wave happened after the surge deflected. The wave departed far from the flare center and showed a close location relative to the deflected surge. The wave propagated in a narrow angular extent, mainly in the ejection direction of the surge. The close timing and location relations between the EUV wave and the surge indicate that the wave was closely associated with the CME. The wave had a velocity of 310-350 km s-1, while the speeds of the surge and the expanding loops were about 130 and 150 km s-1, respectively. All of the results suggest that the EUV wave was a fast-mode wave and was most likely triggered by the weak CME.

  4. Extreme ultraviolet observations from the voyager 2 encounter with saturn.

    PubMed

    Sandel, B R; Shemansky, D E; Broadfoot, A L; Holberg, J B; Smith, G R; McConnell, J C; Strobel, D F; Atreya, S K; Donahue, T M; Moos, H W; Hunten, D M; Pomphrey, R B; Linick, S

    1982-01-29

    Combined analysis of helium (584 angstroms) airglow and the atmospheric occultations of the star delta Scorpii imply a vertical mixing parameter in Saturn's upper atmosphere of K (eddy diffusion coefficient) approximately 8 x 10(7) square centimeters per second, an order of magnitude more vigorous than mixing in Jupiter's upper atmosphere. Atmospheric H(2) band absorption of starlight yields a preliminary temperature of 400 K in the exosphere and a temperature near the homopause of approximately 200 K. The energy source for the mid-latitude H(2) band emission still remains a puzzle. Certain auroral emissions can be fully explained in terms of electron impact on H(2), and auroral morphology suggests a link between the aurora and the Saturn kilometric radiation. Absolute optical depths have been determined for the entire C ring andparts of the A and B rings. A new eccentric ringlet has been detected in the C ring. The extreme ultraviolet reflectance of the rings is fairly uniform at 3.5 to 5 percent. Collisions may control the distribution of H in Titan's H torus, which has a total vertical extent of approximately 14 Saturn radii normal to the orbit plane.

  5. Extreme-ultraviolet ultrafast ARPES at high repetition rates

    NASA Astrophysics Data System (ADS)

    Buss, Jan; Wang, He; Xu, Yiming; Stoll, Sebastian; Zeng, Lingkun; Ulonska, Stefan; Denlinger, Jonathan; Hussain, Zahid; Jozwiak, Chris; Lanzara, Alessandra; Kaindl, Robert

    Time- and angle-resolved photoemission spectroscopy (trARPES) represents a powerful approach to resolve the electronic structure and quasiparticle dynamics in complex materials, yet is often limited in either momentum space (incident photon energy), probe sensitivity (pulse repetition rate), or energy resolution. We demonstrate a novel table-top trARPES setup that combines a bright 50-kHz source of narrowband, extreme ultraviolet (XUV) pulses at 22.3 eV with UHV photoemission instrumentation to sensitively access dynamics for a large momentum space. The output of a high-power Ti:sapphire amplifier is split to provide the XUV probe and intense photoexcitation (up to mJ/cm2) . A vacuum beamline delivers spectral and flux characterization, differential pumping, as well as XUV beam steering and toroidal refocusing onto the sample with high incident flux of 3x1011 ph/s. Photoemission studies are carried out in a customized UHV chamber equipped with a hemispherical analyzer (R4000), six-axis sample cryostat, and side chambers for sample loading, storage and preparation. An ARPES energy resolution down to 70 meV with the direct XUV output is demonstrated. We will discuss initial applications of this setup including Fermi surface mapping and trARPES of complex materials.

  6. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOEpatents

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  7. Extreme and far ultraviolet astronomy from Voyagers 1 and 2

    NASA Technical Reports Server (NTRS)

    Holberg, J. B.

    1990-01-01

    The instrumental characteristics, observational capabilities and scientific results of the Voyager 1 and 2 ultraviolet spectrometers are reviewed. These instruments provide current and ongoing access to low resolution spectra for a wide variety of astronomical sources in the 500 to 1700 A band. Observations of the brightest OB stars and hot subluminous stars as faint as V = 15 mag, are possible. In the EUV, at wavelengths shortward of 900 A, several new sources have been detected and a host of potential sources ruled out. In the far UV, particularly at wavelengths between 900 and 1200 A, Voyager is capable of observing a wide range of stellar and non-stellar sources. Such observations can often provide a valuable complement to IUE and other data sets at longer wavelengths. The Voyager spectrometers have proved remarkably stable photon counting instruments, capable of extremely long integration times. The long integration times, relatively large field of view, and location in the outer solar system also provide an ideal platform for observations of sources of faint diffuse emission, such as nebulae and the general sky background.

  8. Extreme ultraviolet spectrometer for the Shenguang III laser facility.

    PubMed

    Xiong, Gang; Yang, Guohong; Zhang, Jiyan; Wei, Minxi; Zhao, Yang; Qing, Bo; Lv, Min; Yang, Zhenghua; Wang, Feng; Liu, Shenye; Cai, Houzhi; Liu, Jinyuan

    2015-06-10

    An extreme ultraviolet spectrometer has been developed for high-energy density physics experiments at the Shenguang-III (SG-III) laser facility. Alternative use of two different varied-line-spacing gratings covers a wavelength range of 10-260 Å. A newly developed x-ray framing camera with single wide strip line is designed to record time-gated spectra with ~70 ps temporal resolution and 20 lp/mm spatial resolution. The width of the strip line is up to 20 mm, enhancing the capability of the spatial resolving measurements. All components of the x-ray framing camera are roomed in an aluminum air box. The whole spectrometer is mounted on a diagnostic instrument manipulator at the SG-III laser facility for the first time. A new alignment method for the spectrometer based on the superimposition of two laser focal spots is developed. The approaches of the alignment including offline and online two steps are described. A carbon spectrum and an aluminum spectrum have been successfully recorded by the spectrometer using 2400 l/mm and 1200 l/mm gratings, respectively. The experimental spectral lines show that the spectral resolution of the spectrometer is about 0.2 Å and 1 Å for the 2400 l/mm and 1200 l/mm gratings, respectively. A theoretical calculation was carried out to estimate the maximum resolving power of the spectrometer. PMID:26192833

  9. Pattern inspection of etched multilayer extreme ultraviolet mask

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro

    2016-04-01

    Patterned mask inspection for an etched multilayer (ML) extreme ultraviolet mask was investigated. In order to optimize the mask structure from the standpoint of a pattern inspection the mask structure not only from the standpoint of a pattern inspection by using a projection electron microscope but also by using a projection electron microscope but also by considering the other fabrication processes using electron beam techniques such as critical dimension metrology and mask repair, we employed a conductive layer between the ML and substrate. By measuring the secondary electron emission coefficients of the candidate materials for the conductive layer, we evaluated the image contrast and the influence of the charging effect. In the cases of 40-pair ML, 16-nm-sized extrusion and intrusion defects were found to be detectable more than 10 sigma in half pitch 44, 40, and 32 nm line-and-space patterns. Reducing 40-pair ML to 20-pair ML degraded the image contrast and the defect detectability. However, by selecting B4C as a conductive layer, 16-nm-sized defects and etching residues remained detectable. The 16-nm-sized defects were also detected after the etched part was refilled with Si. A double-layer structure with 2.5-nm-thick B4C on metal film used as a conductive layer was found to have sufficient conductivity and also was found to be free from the surface charging effect and influence of native oxide.

  10. Smoothing of Diamond-Turned Substrates for Extreme Ultraviolet Illuminators

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Robinson, J C; Baker, S L; Ratti, S; Johnson, M A; Gullikson, E M

    2003-11-13

    Condenser optics in extreme ultraviolet lithography (EUVL) systems are subjected to frequent replacement as they are positioned close to the illumination source, where increased heating and contamination occur. In the case of aspherical condenser elements made by optical figuring/finishing, their replacement can be very expensive (several hundred thousand dollars). One approach to this problem would be to manufacture inexpensive illuminator optics that meet all required specifications and could be replaced at no substantial cost. Diamond-turned metal substrates are a factor of 100 less expensive than conventional aspherical substrates but have insufficient finish, leading to unacceptably low EUV reflectance after multilayer coating. In this work it is shown that, by applying a smoothing film prior to multilayer coating, the high spatial frequency roughness of a diamond-turned metal substrate is reduced from 1.76 to 0.27 nm rms while the figure slope error is maintained at acceptable levels. Metrology tests performed at various stages of the fabrication of the element demonstrated that it satisfied all critical figure and finish specifications as illuminator. Initial experimental results on the stability and performance of the optic under a real EUVL plasma source environment show no accelerated degradation when compared to conventional substrates.

  11. Extreme Ultraviolet Resist Outgassing Quantification Verification by Resist Film Analysis

    NASA Astrophysics Data System (ADS)

    Kobayashi, Shinji; Santillan, Julius Joseph; Oizumi, Hiroaki; Itani, Toshiro

    2009-06-01

    Numerous investigations on extreme ultraviolet (EUV) resist outgassing have been performed using the pressure rise and gas chromatography mass spectrometry (GC-MS) method. However, the reliability of the results obtained with these methods has not been clearly discussed. In this paper, to analyze and verify the reliability of the resist outgassing results, de-protection reaction and photo acid generator's (PAG's) decomposing reaction in the resist film, which are viewed as the main source of resist outgassing, are investigated using the Fourier transform infrared spectroscopy (FT-IR). Analysis was performed on a resist film after EUV exposure, before post exposure bake (PEB). Based on the measured amount of de-protection reaction in the resist film, the amounts of resist outgassing released were calculated. It was found that the resist outgassing amount obtained through FT-IR was somewhere between those obtained using the pressure rise and GC-MS methods results. These similarities in the results substantiate the reliability of resist outgassing amounts obtained through these analysis methods.

  12. Extreme ultraviolet (EUV) and FUV calibration facility for special sensor ultraviolet limb imager (SSULI)

    NASA Astrophysics Data System (ADS)

    Boyer, Craig N.; Osterman, Steven N.; Thonnard, Stefan E.; McCoy, Robert P.; Williams, J. Z.; Parker, S. E.

    1994-09-01

    A facility for calibrating far ultraviolet and extreme ultraviolet instruments has recently been completed at the Naval Research Laboratory. Our vacuum calibration vessel is 2-m in length, 1.67-m in diameter, and can accommodate optical test benches up to 1.2-m wide by 1.5-m in length. A kinematically positioned frame with four axis precision pointing capability of 10 microns for linear translation and .01 degrees for rotation is presently used during vacuum optical calibration of SSULI. The chamber was fabricated from 304 stainless steel and polished internally to reduce surface outgassing. A dust-free environment is maintained at the rear of the vacuum chamber by enclosing the 2-m hinged vacuum access door in an 8 ft. by 8 ft. class 100 clean room. Every effort was made to obtain an oil-free environment within the vacuum vessel. Outgassing products are continually monitored with a 1 - 200 amu residual gas analyzer. An oil-free claw and vane pump evacuates the chamber to 10-2 torr through 4 in. diameter stainless steel roughing lines. High vacuum is achieved and maintained with a magnetically levitated 480 l/s turbo pump and a 3000 l/s He4 cryopump. Either of two vacuum monochrometers, a 1-m f/10.4 or a 0.2-m f/4.5 are coaxially aligned with the optical axis of the chamber and are used to select single UV atomic resonance lines from a windowless capillary or penning discharge UV light source. A calibrated channeltron detector is coaxially mounted with the SSULI detector during calibration. All vacuum valves, the cooling system for the cryopump compressor, and the roughing pump are controlled through optical fibers which are interfaced to a computer through a VME board. Optical fibers were chosen to ensure that complete electrical isolation is maintained between the computer and the vacuum system valves-solenoids and relays.

  13. Extreme ultraviolet spectra of solar flares from the extreme ultraviolet spectroheliograph SPIRIT onboard the CORONAS-F satellite

    SciTech Connect

    Shestov, S.; Kuzin, S.; Reva, A.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ∼0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK; most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ∼ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 10{sup 9} cm{sup –3}. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  14. Spectral catalogue of the intermediate ionization states of iron in the extreme ultraviolet

    SciTech Connect

    Beiersdorfer, P.; Utter, S.B.; Brown, G.V.

    1998-05-13

    Using precisely controlled laboratory conditions we have begun to establish a spectral catalogue of the intermediate ionization states of iron, Fe IX - Fe XXIV, in the extreme ultraviolet. The measurements are being performed in support of the development of reliable modeling codes for the analysis of data from the Extreme Ultraviolet Explorer and future space astrophysics missions sensitive to extreme ultraviolet radiation. They aim to resolve the controversies surrounding the short-wavelength spectra of stellar coronae. Preliminary measurements showing the wealth of iron lines in the 50-120 {Angstrom} region are presented.

  15. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination.

  16. NEW SOLAR EXTREME-ULTRAVIOLET IRRADIANCE OBSERVATIONS DURING FLARES

    SciTech Connect

    Woods, Thomas N.; Hock, Rachel; Eparvier, Frank; Jones, Andrew R.; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Warren, Harry; Schrijver, Carolus J.; Webb, David F.; Bailey, Scott; Tobiska, W. Kent

    2011-10-01

    New solar extreme-ultraviolet (EUV) irradiance observations from the NASA Solar Dynamics Observatory (SDO) EUV Variability Experiment provide full coverage in the EUV range from 0.1 to 106 nm and continuously at a cadence of 10 s for spectra at 0.1 nm resolution and even faster, 0.25 s, for six EUV bands. These observations can be decomposed into four distinct characteristics during flares. First, the emissions that dominate during the flare's impulsive phase are the transition region emissions, such as the He II 30.4 nm. Second, the hot coronal emissions above 5 MK dominate during the gradual phase and are highly correlated with the GOES X-ray. A third flare characteristic in the EUV is coronal dimming, seen best in the cool corona, such as the Fe IX 17.1 nm. As the post-flare loops reconnect and cool, many of the EUV coronal emissions peak a few minutes after the GOES X-ray peak. One interesting variation of the post-eruptive loop reconnection is that warm coronal emissions (e.g., Fe XVI 33.5 nm) sometimes exhibit a second large peak separated from the primary flare event by many minutes to hours, with EUV emission originating not from the original flare site and its immediate vicinity, but rather from a volume of higher loops. We refer to this second peak as the EUV late phase. The characterization of many flares during the SDO mission is provided, including quantification of the spectral irradiance from the EUV late phase that cannot be inferred from GOES X-ray diagnostics.

  17. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. PMID:27140543

  18. Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

    NASA Astrophysics Data System (ADS)

    Svalgaard, Leif

    2016-08-01

    Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

  19. Solar extreme ultraviolet sensor and advanced langmuir probe

    NASA Technical Reports Server (NTRS)

    Voronka, N. R.; Block, B. P.; Carignan, G. R.

    1992-01-01

    For more than two decades, the staff of the Space Physics Research Laboratory (SPRL) has collaborated with the Goddard Space Flight Center (GSFC) in the design and implementation of Langmuir probes (LP). This program of probe development under the direction of Larry Brace of GSFC has evolved methodically with innovations to: improve measurement precision, increase the speed of measurement, and reduce the weight, size, power consumption and data rate of the instrument. Under contract NAG5-419 these improvements were implemented and are what characterize the Advanced Langmuir Probe (ALP). Using data from the Langmuir Probe on the Pioneer Venus Orbiter, Brace and Walter Hoegy of GSFC demonstrated a novel method of monitoring the solar extreme ultraviolet (EUV) flux. This led to the idea of developing a sensor similar to a Langmuir probe specifically designed to measure solar EUV (SEUV) that uses a similar electronics package. Under this contract, a combined instrument package of the ALP and SEUV sensor was to be designed, constructed, and laboratory tested. Finally the instrument was to be flight tested as part of sounding rocket experiment to acquire the necessary data to validate this method for possible use in future earth and planetary aeronomy missions. The primary purpose of this contract was to develop the electronics hardware and software for this instrument, since the actual sensors were suppied by GSFC. Due to budget constraints, only a flight model was constructed. These electronics were tested and calibrated in the laboratory, and then the instrument was integrated into the rocket payload at Wallops Flight Facility where it underwent environmental testing. After instrument recalibration at SPRL, the payload was reintegrated and launched from the Poker Flat Research Range near Fairbanks Alaska. The payload was successfully recovered and after refurbishment underwent further testing and developing to improve its performance for future use.

  20. Extreme Ultraviolet Emission Lines of Iron Fe XI-XIII

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan; Beiersdorfer, P.; Brown, G. V.; Liedahl, D. A.; Brickhouse, N. S.; Dupree, A. K.

    2013-04-01

    The extreme ultraviolet (EUV) spectral region (ca. 20--300 Å) is rich in emission lines from low- to mid-Z ions, particularly from the middle charge states of iron. Many of these emission lines are important diagnostics for astrophysical plasmas, providing information on properties such as elemental abundance, temperature, density, and even magnetic field strength. In recent years, strides have been made to understand the complexity of the atomic levels of the ions that emit the lines that contribute to the richness of the EUV region. Laboratory measurements have been made to verify and benchmark the lines. Here, we present laboratory measurements of Fe XI, Fe XII, and Fe XIII between 40-140 Å. The measurements were made at the Lawrence Livermore electron beam ion trap (EBIT) facility, which has been optimized for laboratory astrophysics, and which allows us to select specific charge states of iron to help line identification. We also present new calculations by the Hebrew University - Lawrence Livermore Atomic Code (HULLAC), which we also utilized for line identification. We found that HULLAC does a creditable job of reproducing the forest of lines we observed in the EBIT spectra, although line positions are in need of adjustment, and line intensities often differed from those observed. We identify or confirm a number of new lines for these charge states. This work was supported by the NASA Solar and Heliospheric Program under Contract NNH10AN31I and the DOE General Plasma Science program. Work was performed in part under the auspices of the Department of Energy by Lawrence Livermore National Laboratory under Contract DEAC52-07NA27344.

  1. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    NASA Astrophysics Data System (ADS)

    Chen, Hong; Wang, Xinbing; Duan, Lian; Lan, Hui; Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-01

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer-Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  2. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    SciTech Connect

    Chen, Hong; Duan, Lian; Lan, Hui; Wang, Xinbing Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  3. Detection of Coherent Structures in Extreme-Scale Simulations

    SciTech Connect

    Kamath, C; Iverson, J; Kirk, R; Karypis, G

    2012-03-24

    The analysis of coherent structures is a common problem in many scientific domains ranging from astrophysics to combustion, fusion, and materials science. The data from three-dimensional simulations are analyzed to detect the structures, extract statistics on them, and track them over time to gain insights into the phenomenon being modeled. This analysis is typically done off-line, using data that have been written out by the simulations. However, the move towards extreme scale architectures, with multi-core processors and graphical processing units, will affect how such analysis is done as it is unlikely that the systems will support the I/O bandwidth required for off-line analysis. Moving the analysis in-situ is a solution only if we know a priori what analysis will be done, as well as the algorithms used and their parameter settings. Even then, we need to ensure that this will not substantially increase the memory requirements or the data movement as the former will be limited and the latter will be expensive. In the Exa-DM project, a collaboration between Lawrence Livermore National Laboratory and University of Minnesota, we are exploring ways in which we can address the conflicting demands of coherent structure analysis of simulation data and the architecture of modern parallel systems, while enabling scientific discovery at the exascale. In this paper, we describe our work in two areas: the in situ implementation of an existing algorithm for coherent structure analysis and the use of graph-based techniques to efficiently compress the data.

  4. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Technical Reports Server (NTRS)

    Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

    2010-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  5. ATOMIC AND MOLECULAR PHYSICS: Generation of Continuum Extreme-Ultraviolet Radiation by Carrier-Envelope-Phase-Stabilized 5-fs Laser Pulses

    NASA Astrophysics Data System (ADS)

    Teng, Hao; Yun, Chen-Xia; Zhu, Jiang-Feng; Han, Hai-Nian; Zhong, Xin; Zhang, Wei; Hou, Xun; Wei, Zhi-Yi

    2009-11-01

    Coherent extreme-ultraviolet (XUV) radiation is studied by interaction of carrier-envelope (CE) phase stabilized high energy 5-fs infrared (800 nm) laser pulses with neon gas at a repetition rate of 1 kHz. A broadband continuum XUV spectrum in the cut-off region is demonstrated when the CE phase is shifted to about zero, rather than modulated spectral harmonics when setting of CE phase is nonzero. The results show the generation of isolated attosecond XUV pulses.

  6. Vacuum ultraviolet circularly polarized coherent femtosecond pulses from laser seeded relativistic electrons

    NASA Astrophysics Data System (ADS)

    Čutić, N.; Lindau, F.; Thorin, S.; Werin, S.; Bahrdt, J.; Eberhardt, W.; Holldack, K.; Erny, C.; L'Huillier, A.; Mansten, E.

    2011-03-01

    We have demonstrated the generation of circularly polarized coherent light pulses at 66 nm wavelength by combining laser seeding at 263 nm of a 375 MeV relativistic electron bunch with subsequent coherent harmonic generation from an elliptical undulator of APPLE-II type. Coherent pulses at higher harmonics in linear polarization have been produced and recorded up to the sixth order (44 nm). The duration of the generated pulses depends on the temporal overlap of the initial seed laser pulse and the electron bunch and was on the order of 200 fs. Currently, this setup is the only source worldwide producing coherent fs-light pulses with variable polarization in the vacuum ultraviolet.

  7. Observations of extreme ultraviolet emissions from the Saturnian plasmasphere

    NASA Technical Reports Server (NTRS)

    Wu, F. M.; Judge, D. L.; Carlson, R. W.

    1980-01-01

    Emission signals from the Saturnian plasmasphere at wavelengths shortward of 800 A have been detected by the Pioneer ultraviolet photometer. The surface brightness of the emissions is about 0.3 + or - 0.2 R. These short-wavelength emissions are interpreted as arising primarily from the radiative decay of electron-excited atomic oxygen ions (O(2+)), in the region between 5 and 7 Saturn radii from Saturn. The total power radiated by the Saturnian plasma inferred from these ultraviolet measurements is about 2 x 10 to the 16th erg/sec, consistent with in situ plasma measurements. From the observed energy loss rate it is estimated that the ions are introduced into the plasma torus at a rate of 8 x 10 to the 25th ions/sec, possibly through the sputtering of water ice on the surface of Tethys and Dione by particle impact.

  8. Lensless hyperspectral spectromicroscopy with a tabletop extreme-ultraviolet source

    NASA Astrophysics Data System (ADS)

    Gardner, Dennis F.; Zhang, Bosheng; Seaberg, Matthew H.; Shanblatt, Elisabeth R.; Porter, Christina L.; Karl, Robert; Mancuso, Christopher; Kapteyn, Henry C.; Murnane, Margaret M.; Adams, Daniel E.

    2016-03-01

    We demonstrate hyperspectral coherent imaging in the EUV spectral region for the first time, without the need for hardware-based wavelength separation. This new scheme of spectromicroscopy is the most efficient use of EUV photons for imaging because there is no energy loss from mirrors or monochromatizing optics. An EUV spectral comb from a tabletop high-harmonic source, centered at a wavelength of 30nm, illuminates the sample and the scattered light is collected on a pixel-array detector. Using a lensless imaging technique known as ptychographical information multiplexing, we simultaneously retrieve images of the spectral response of the sample at each individual harmonic. We show that the retrieved spectral amplitude and phase agrees with theoretical predictions. This work demonstrates the power of coherent EUV beams for rapid material identification with nanometer-scale resolution.

  9. Atmosphere and water loss from early Mars under extreme solar wind and extreme ultraviolet conditions.

    PubMed

    Terada, Naoki; Kulikov, Yuri N; Lammer, Helmut; Lichtenegger, Herbert I M; Tanaka, Takashi; Shinagawa, Hiroyuki; Zhang, Tielong

    2009-01-01

    The upper limits of the ion pickup and cold ion outflow loss rates from the early martian atmosphere shortly after the Sun arrived at the Zero-Age-Main-Sequence (ZAMS) were investigated. We applied a comprehensive 3-D multi-species magnetohydrodynamic (MHD) model to an early martian CO(2)-rich atmosphere, which was assumed to have been exposed to a solar XUV [X-ray and extreme ultraviolet (EUV)] flux that was 100 times higher than today and a solar wind that was about 300 times denser. We also assumed the late onset of a planetary magnetic dynamo, so that Mars had no strong intrinsic magnetic field at that early period. We found that, due to such extreme solar wind-atmosphere interaction, a strong magnetic field of about approximately 4000 nT was induced in the entire dayside ionosphere, which could efficiently protect the upper atmosphere from sputtering loss. A planetary obstacle ( approximately ionopause) was formed at an altitude of about 1000 km above the surface due to the drag force and the mass loading by newly created ions in the highly extended upper atmosphere. We obtained an O(+) loss rate by the ion pickup process, which takes place above the ionopause, of about 1.5 x 10(28) ions/s during the first < or =150 million years, which is about 10(4) times greater than today and corresponds to a water loss equivalent to a global martian ocean with a depth of approximately 8 m. Consequently, even if the magnetic protection due to the expected early martian magnetic dynamo is neglected, ion pickup and sputtering were most likely not the dominant loss processes for the planet's initial atmosphere and water inventory. However, it appears that the cold ion outflow into the martian tail, due to the transfer of momentum from the solar wind to the ionospheric plasma, could have removed a global ocean with a depth of 10-70 m during the first < or =150 million years after the Sun arrived at the ZAMS.

  10. Atmosphere and water loss from early Mars under extreme solar wind and extreme ultraviolet conditions.

    PubMed

    Terada, Naoki; Kulikov, Yuri N; Lammer, Helmut; Lichtenegger, Herbert I M; Tanaka, Takashi; Shinagawa, Hiroyuki; Zhang, Tielong

    2009-01-01

    The upper limits of the ion pickup and cold ion outflow loss rates from the early martian atmosphere shortly after the Sun arrived at the Zero-Age-Main-Sequence (ZAMS) were investigated. We applied a comprehensive 3-D multi-species magnetohydrodynamic (MHD) model to an early martian CO(2)-rich atmosphere, which was assumed to have been exposed to a solar XUV [X-ray and extreme ultraviolet (EUV)] flux that was 100 times higher than today and a solar wind that was about 300 times denser. We also assumed the late onset of a planetary magnetic dynamo, so that Mars had no strong intrinsic magnetic field at that early period. We found that, due to such extreme solar wind-atmosphere interaction, a strong magnetic field of about approximately 4000 nT was induced in the entire dayside ionosphere, which could efficiently protect the upper atmosphere from sputtering loss. A planetary obstacle ( approximately ionopause) was formed at an altitude of about 1000 km above the surface due to the drag force and the mass loading by newly created ions in the highly extended upper atmosphere. We obtained an O(+) loss rate by the ion pickup process, which takes place above the ionopause, of about 1.5 x 10(28) ions/s during the first < or =150 million years, which is about 10(4) times greater than today and corresponds to a water loss equivalent to a global martian ocean with a depth of approximately 8 m. Consequently, even if the magnetic protection due to the expected early martian magnetic dynamo is neglected, ion pickup and sputtering were most likely not the dominant loss processes for the planet's initial atmosphere and water inventory. However, it appears that the cold ion outflow into the martian tail, due to the transfer of momentum from the solar wind to the ionospheric plasma, could have removed a global ocean with a depth of 10-70 m during the first < or =150 million years after the Sun arrived at the ZAMS. PMID:19216683

  11. [Theoretical analysis and experimental measurement for secondary electron yield of microchannel plate in extreme ultraviolet region].

    PubMed

    Li, Min; Ni, Qi-liang; Dong, Ning-ning; Chen, Bo

    2010-08-01

    Photon counting detectors based on microchannel plate have widespread applications in astronomy. The present paper deeply studies secondary electron of microchannel plate in extreme ultraviolet. A theoretical model describing extreme ultraviolet-excited secondary electron yield is presented, and the factor affecting on the secondary electron yields of both electrode and lead glass which consist of microchannel plate is analyzed according to theoretical formula derived from the model. The result shows that the higher secondary electron yield is obtained under appropriate condition that the thickness of material is more than 20 nm and the grazing incidence angle is larger than the critical angle. Except for several wavelengths, the secondary electron yields of both electrode and lead glass decrease along with the increase in the wavelength And also the quantum efficiency of microchannel plate is measured using quantum efficiency test set-up with laser-produced plasmas source as an extreme ultraviolet radiation source, and the result of experiment agrees with theoretical analysis.

  12. Three new extreme ultraviolet spectrometers on NSTX-U for impurity monitoring

    NASA Astrophysics Data System (ADS)

    Weller, M. E.; Beiersdorfer, P.; Soukhanovskii, V. A.; Magee, E. W.; Scotti, F.

    2016-11-01

    Three extreme ultraviolet (EUV) spectrometers have been mounted on the National Spherical Torus Experiment-Upgrade (NSTX-U). All three are flat-field grazing-incidence spectrometers and are dubbed X-ray and Extreme Ultraviolet Spectrometer (XEUS, 8-70 Å), Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS, 190-440 Å), and Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50-220 Å). XEUS and LoWEUS were previously implemented on NSTX to monitor impurities from low- to high-Z sources and to study impurity transport while MonaLisa is new and provides the system increased spectral coverage. The spectrometers will also be a critical diagnostic on the planned laser blow-off system for NSTX-U, which will be used for impurity edge and core ion transport studies, edge-transport code development, and benchmarking atomic physics codes.

  13. Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

    NASA Technical Reports Server (NTRS)

    Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

    1988-01-01

    The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

  14. Laser triggered Z-pinch broadband extreme ultraviolet source for metrology

    SciTech Connect

    Tobin, I.; Lunney, J. G.; Juschkin, L.; Sidelnikov, Y.; O'Reilly, F.; Sokell, E.; Sheridan, P.

    2013-05-20

    We compare the extreme ultraviolet emission characteristics of tin and galinstan (atomic %: Ga: 78.35, In: 14.93, Sn: 6.72) between 10 nm and 18 nm in a laser-triggered discharge between liquid metal-coated electrodes. Over this wavelength range, the energy conversion efficiency for galinstan is approximately half that of tin, but the spectrum is less strongly peaked in the 13-15 nm region. The extreme ultraviolet source dimensions were 110 {+-} 25 {mu}m diameter and 500 {+-} 125 {mu}m length. The flatter spectrum, and -19 Degree-Sign C melting point, makes this galinstan discharge a relatively simple high radiance extreme ultraviolet light source for metrology and scientific applications.

  15. Sun's image in the extreme ultraviolet radiation emitted from the corona

    NASA Technical Reports Server (NTRS)

    1973-01-01

    The Skylab space station's Extreme Ultraviolet monitor is a closed loop television system that permitted man for the first time to watch the Sun's image in the extreme ultraviolet radiation emitted from its million-degree outer atmosphere, the corona. This photograph shows a view of the TV scope made by Scientist-Astronaut Owen K. Garriott, Skylab 3 science pilot, on August 15, 1973. Dr. Garriott made this picture with a Land-Polaroid SX-70 camera - the first time that any Polaroid camera has been used in space.

  16. Flat field response of the microchannel plate detectors used on the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Gibson, J. L.; Siegmund, O. H. W.; Vedder, P. W.

    1989-01-01

    The results of the extreme ultraviolet (EUV) flat field calibrations of two of the flight detectors to be flown on the Extreme Ultraviolet Explorer Satellite (EUVE) are presented. Images of about 40 million detected events binned 512 by 512 are sufficient to show microchannel plate fixed pattern noise such as hexagonal microchannel multifiber bundle interfaces, 'dead' spots, edge distortion, and differential nonlinearity. Differences due to photocathode material and dependencies on EUV wavelength are also described. Over large spatial scales, the detector response is flat to better than 10 percent of the mean response, but, at spatial scales less than 1 mm, the variations from the mean can be as large as 20 percent.

  17. Explosion of Xenon Clusters Driven by Intense Femtosecond Pulses of Extreme Ultraviolet Light

    SciTech Connect

    Murphy, B. F.; Hoffmann, K.; Belolipetski, A.; Keto, J.; Ditmire, T.

    2008-11-14

    The explosions of large xenon clusters irradiated by intense, femtosecond extreme ultraviolet pulses at a wavelength of 38 nm have been studied. Using high harmonic generation from a 35 fs laser, clusters have been irradiated by extreme ultraviolet pulses at intensity approaching 10{sup 11} W/cm{sup 2}. Charge states up to Xe{sup 8+} are observed, states well above those produced by single atom illumination, indicating that plasma continuum lowering is important. Furthermore, the kinetic energy distribution of the exploding ions is consistent with a quasineutral hydrodynamic expansion, rather than a Coulomb explosion.

  18. Wave-mixing with high-order harmonics in extreme ultraviolet region

    SciTech Connect

    Dao, Lap Van; Dinh, Khuong Ba; Le, Hoang Vu; Gaffney, Naylyn; Hannaford, Peter

    2015-01-12

    We report studies of the wave-mixing process in the extreme ultraviolet region with two near-infrared driving and controlling pulses with incommensurate frequencies (at 1400 nm and 800 nm). A non-collinear scheme for the two beams is used in order to spatially separate and to characterise the properties of the high-order wave-mixing field. We show that the extreme ultraviolet frequency mixing can be treated by perturbative, very high-order nonlinear optics; the modification of the wave-packet of the free electron needs to be considered in this process.

  19. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C.; Chow, W.W.

    1995-06-01

    Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.

  20. Operation of a free electron laser in the wavelength range from the extreme ultraviolet to the water window

    SciTech Connect

    Ackermann, W.; Asova, G.; Ayvazyan, V.; Azima, A.; Baboi, N.; Bahr, J.; Balandin, V.; Beutner, B.; Brandt, A.; Bolzmann, A.; Brinkmann, R.; /DESY /Dubna, JINR

    2007-01-01

    We report results on the performance of a free-electron laser operating at a wavelength of 13.7 nm where unprecedented peak and average powers for a coherent extreme-ultraviolet radiation source have been measured. In the saturation regime, the peak energy approached 170 J for individual pulses, and the average energy per pulse reached 70 J. The pulse duration was in the region of 10 fs, and peak powers of 10 GW were achieved. At a pulse repetition frequency of 700 pulses per second, the average extreme-ultraviolet power reached 20 mW. The output beam also contained a significant contribution from odd harmonics of approximately 0.6% and 0.03% for the 3rd (4.6 nm) and the 5th (2.75 nm) harmonics, respectively. At 2.75 nm the 5th harmonic of the radiation reaches deep into the water window, a wavelength range that is crucially important for the investigation of biological samples.

  1. Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography

    SciTech Connect

    Naulleau, Patrick

    2009-05-25

    As critical dimensions for leading-edge semiconductor devices shrink, line-edge roughness (LER) requirements are pushing well into the single digit nanometer regime. At these scales many new sources of LER must be considered. In the case of extreme ultraviolet (EUV) lithography, modeling has shown the lithographic mask to be a source of significant concern. Here we present a correlation-based methodology for experimentally measuring the magnitude of mask contributors to printed LER. The method is applied to recent printing results from a 0.3 numerical aperture EUV microfield exposure tool. The measurements demonstrate that such effects are indeed present and of significant magnitude. The method is also used to explore the effects of illumination coherence and defocus and has been used to verify model-based predictions of mask-induced LER.

  2. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Holm, A. V.; Boggess, A.

    1982-01-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  3. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period July 2001 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme Ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  4. Solar-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2002-01-01

    This Monthly Progress Report covers the reporting period August 2002 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  5. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period through June 2001, Phase C/D, Detailed Design and Development Through Launch Plus Thirty Days, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  6. Ion-beam-deposited boron carbide coatings for the extreme ultraviolet.

    PubMed

    Blumenstock, G M; Keski-Kuha, R A

    1994-09-01

    The normal-incidence reflectance of ion-beam-deposited boron carbide thin films has been evaluated in the extreme ultraviolet (EUV) spectral region. High-reflectance coatings have been produced with reflectances greater than 30% between 67 and 121.6 nm. This high reflectance makes ion-beam-deposited boron carbide an attractive coating for EUV applications.

  7. Comparing Vacuum and Extreme Ultraviolet Radiation for Postionization of Laser Desorbed Neutrals from Bacterial Biofilms and Organic Fullerene

    SciTech Connect

    Gaspera, Gerald L.; Takahashi, Lynelle K.; Zhou, Jia; Ahmed, Musahid; Moored, Jerry F.; Hanley, Luke

    2010-12-08

    Vacuum and extreme ultraviolet radiation from 8 - 24 eV generated at a synchrotron was used to postionize laser desorbed neutrals of antibiotic-treated biofilms and a modified fullerene using laser desorption postionization mass spectrometry (LDPI-MS). Results show detection of the parent ion, various fragments, and extracellular material from biofilms using LDPI-MS with both vacuum and extreme ultraviolet photons. Parent ions were observed for both cases, but extreme ultraviolet photons (16-24 eV) induced more fragmentation than vacuum ultraviolet (8-14 eV) photons.

  8. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  9. A study of extreme-ultraviolet emission from cataclysmic variables

    NASA Technical Reports Server (NTRS)

    Polidan, Ronald S.; Mauche, Christopher W.; Wade, Richard A.

    1990-01-01

    Voyager far- and extreme UV spectrophotometric observations of five cataclysmic variables (the dwarf novae SS Cyg and VW Hyi and the novalike variables V3885 Sgr, RW Sex, and IX Vel) are combined with neutral hydrogen column densities derived from the curve-of-growth analysis of interstellar absorption lines in high-resolution IUE spectra to place upper limits on the emitted flux in the 600-700 A EUV band. The Voyager observations of VW Hyi were obtained during both normal and superoutbursts. Detailed accretion disk model calculations show that most of the 600-700 A flux in these systems should originate in the inner accretion disk rather than in the boundary layer. For VW Hyi, the low neutral hydrogen column and excellent Voyager superoutburst data place the observed upper limit to the 600-700 A flux well below the expected EUV flux from the model calculations.

  10. Polarization-ratio reflectance measurements in the extreme ultraviolet.

    PubMed

    Brimhall, N; Heilmann, N; Ware, M; Peatross, J

    2009-05-01

    We demonstrate a technique for determining optical constants of materials in the extreme UV from the ratio of p-polarized to s-polarized reflectance. The measurements are based on laser-generated high-order harmonics, which have easily rotatable linear polarization but that are prone to brightness fluctuations and systematic drifts during measurement. Rather than measure the absolute reflectance, we extract the optical constants of a material from the ratio of p-polarized to s-polarized reflectance at multiple incident angles. This has the advantage of dividing out long-term fluctuations and possible systematic errors. We show that the reflectance ratio is as sensitive as the absolute reflectance to material optical properties.

  11. Extreme ultraviolet spectroheliograph ATM experiment S082A.

    PubMed

    Tousey, R; Bartoe, J D; Brueckner, G E; Purcell, J D

    1977-04-01

    The XUV spectroheliograph, Apollo Telescope Mount experiment S082A, is described. The instrument was a slitless Wadsworth grating spectrograph that employed photographic recording. The grating was of 4-m radius, ruled with 3600 grooves/mm. By rotating the grating to positions where the normal was at 255 A or 400 A, the spectral ranges 175-335 A and 320-480 A, respectively, were covered with 2-sec of arc spatial resolution. Close to the normal the resolution reached 2 sec of arc, but at the extreme limit, 630 A, it was 10 sec of arc or worse. The aberrations of the instrument are discussed in detail as are the provisions necessary to maintain optimum imagery and reliability in a space environment. During the mission about 1020 exposures were made covering 171-335 A or 320-630 A.

  12. Frequency Up-Conversion to the Vacuum Ultra-Violet in Coherently Prepared Media

    NASA Astrophysics Data System (ADS)

    Marangos, J. P.; Kuçukkara, I.; Anscombe, M.

    In this contribution we discuss recent work that has demonstrated that electromagnetically induced transparency (EIT) can greatly increase the intensity of coherent vacuum ultra-violet (VUV) radiation (at wavelengths shorter than 130nm) generated in resonant four-wave mixing schemes. We will start by introducing the basic concept of EIT enhanced resonant four-wave mixing, comparing it briefly with other coherently enhanced non-linear frequency up-conversion schemes. Experiments proving this concept in atomic hydrogen in the mid-1990's will be summarised. Our own recent work on EIT enhanced four-wave mixing in Kr will be presented and recent results demonstrating high conversion efficiencies into the VUV, and the limits placed on this process at high density-length products, will be discussed.

  13. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo; Huang, Jianping

    2016-07-01

    Following the extreme solar minimum during 2008 - 2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, we compare the solar EUV spectral irradiance between SC23 and SC24, using the measurements by the Solar EUV Experiment (SEE) on the Thermospheric Ionospheric Mesospheric Energy and Dynamics (TIMED) spacecraft. The EUV spectrum varies with solar activity, and is in general a linear function of a proxy index P= (F10.7 + F10.7A)/2. However, we find the slope of this function, i.e., the change rate of irradiance at each wavelength with P, differs between SC23 and SC24. Consequently, at a given P level, the irradiance in SC24 is higher at wavelength of 30 - 50 nm, but lower at 60 - 120 nm and longward of 140 nm; the inter-cycle variation of EUV irradiance at some wavelengths can be 30 - 40% in absolute flux. We further examine 38 most intense emission lines and find that, taking P as a reference, most of the bright coronal lines get stronger in SC24 and, by contrast, those from the chromosphere and transition region have less variability in SC24. We therefore suggest that, the empirical relation between solar EUV and P, which is derived from observations in previous solar cycles, may not adapt to SC24. The changes in EUV spectrum need to be considered in the models for aeronomic study, especially those using F10.7 index as an input parameter.

  14. High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity.

    PubMed

    Brandi, F; Neshev, D; Ubachs, W

    2003-10-17

    Production of extreme-ultraviolet radiation by high-order harmonic generation is demonstrated to yield unprecedented spectral purity of lambda/Delta lambda=2.5 x 10(5) at wavelengths covering the entire range 40-100 nm. Tunability and sub-cm(-1) bandwidth of the harmonics are demonstrated in recordings of the He (1s4p) and Ar (3p(5)3d') resonance lines at 52.2 and 86.6 nm. Frequency shift of the harmonics due to chirp-induced phenomena are investigated and found to be small, resulting in a frequency accuracy of about 5 x 10(-7) in the domain of extreme-ultraviolet radiation.

  15. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  16. Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

    NASA Astrophysics Data System (ADS)

    Oyama, Tomoko Gowa; Oshima, Akihiro; Tagawa, Seiichi

    2016-08-01

    It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, we calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).

  17. Investigations on the emission in the extreme ultraviolet of a pseudospark based discharge light source

    NASA Astrophysics Data System (ADS)

    Bergmann, Klaus; Vieker, Jochen; von Wezyk, Alexander

    2016-10-01

    A new concept of a discharge based extreme ultraviolet radiation source is presented. This concept is based on an electrode system that consists of two consecutive pseudospark discharge stages. The first stage is used to create a pinch plasma as emitter in the extreme ultraviolet and soft X-ray range and the second stage is used as a high current switch between the storage capacity and the first stage. First results on the emission characteristics for the working gases nitrogen, krypton, and xenon, with focus on the emission at 2.88 nm, 6-7 nm, and around 13.5 nm, respectively, are disclosed under the aspect of the access to a larger discharge parameter range. It is shown that this increased range opens a path to a higher spectral peak brightness.

  18. X-ray and extreme ultraviolet imaging using layered synthetic microstructures

    NASA Technical Reports Server (NTRS)

    Underwood, J. H.; Barbee, T. W.; Shealy, D. L.

    1982-01-01

    Up to now designers of X-ray optical instruments such as microscopes and telescopes have been compelled to use mirrors operating at small glancing angles. However, using vapor deposition techniques, it is now possible to build multilayered thin film structures in which the individual layers have thicknesses comparable with a wavelength of X-rays. These devices operate in a manner exactly analogous to multilayer dielectric coatings at visible wavelengths and can be used to increase the X-ray and extreme ultraviolet reflectivity of surfaces at large glancing angles. These X-ray mirrors have numerous potential applications in X-ray optics. Attention is given to X-ray images with a normal incidence mirror, and applications of multilayer optics. Single-mirror telescopes for solar/stellar astronomy are discussed, taking into account solar corona and transition region studies, and X-ray and extreme ultraviolet astronomy. Hybrid X-ray telescopes are also considered.

  19. Extreme Ultraviolet Imaging of Electron Heated Targets in Petawatt Laser Experiments

    SciTech Connect

    Ma, T; MacPhee, A; Key, M; Akli, K; Mackinnon, A; Chen, C; Barbee, T; Freeman, R; King, J; Link, A; Offermann, D; Ovchinnikov, V; Patel, P; Stephens, R; VanWoerkom, L; Zhang, B; Beg, F

    2007-11-29

    The study of the transport of electrons, and the flow of energy into a solid target or dense plasma, is instrumental in the development of fast ignition inertial confinement fusion. An extreme ultraviolet (XUV) imaging diagnostic at 256 eV and 68 eV provides information about heating and energy deposition within petawatt laser-irradiated targets. XUV images of several irradiated solid targets are presented.

  20. A NOISE ADAPTIVE FUZZY EQUALIZATION METHOD FOR PROCESSING SOLAR EXTREME ULTRAVIOLET IMAGES

    SciTech Connect

    Druckmueller, M.

    2013-08-15

    A new image enhancement tool ideally suited for the visualization of fine structures in extreme ultraviolet images of the corona is presented in this paper. The Noise Adaptive Fuzzy Equalization method is particularly suited for the exceptionally high dynamic range images from the Atmospheric Imaging Assembly instrument on the Solar Dynamics Observatory. This method produces artifact-free images and gives significantly better results than methods based on convolution or Fourier transform which are often used for that purpose.

  1. Transmission grating based extreme ultraviolet imaging spectrometer for time and space resolved impurity measurements.

    PubMed

    Kumar, Deepak; Stutman, Dan; Tritz, Kevin; Finkenthal, Michael; Tarrio, Charles; Grantham, Steven

    2010-10-01

    A free standing transmission grating based imaging spectrometer in the extreme ultraviolet range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral range from 30 to 700 Å and has a resolving capability of δλ/λ on the order of 3%. Initial results from space resolved impurity measurements from NSTX are described in this paper.

  2. Apollo-Soyuz test project Extreme Ultraviolet Telescope MA-083. [stellar spectra

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1978-01-01

    Follow-on studies to the Apollo-Soyuz Extreme Ultraviolet Telescope experiment (MA-083) include analyses of individual target stars or classes of stars, not only with regard to the EUV data but also in connection with theoretical models and observations in other parts of the spectrum. Topics discussed include: observations of SS Cygni, Proxima Centauri, HZ 43, and Feige 24; computer searches for new EUV sources; Sirius: models and inferences; EUV emission from a hot gas; and the diffuse EUV background.

  3. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Barkusky, Frank; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  4. High-resolution extreme-ultraviolet spectroscopy of potassium using anti-Stokes radiation

    NASA Technical Reports Server (NTRS)

    Rothenberg, J. E.; Young, J. F.; Harris, S. E.

    1981-01-01

    The use of a new extreme-ultraviolet radiation source based on spontaneous anti-Stokes scattering for high-resolution absorption spectroscopy of transition originating from the 3p6 shell of potassium is reported. The region from 546.6 to 536.8 A is scanned at a resolution of about 1.2 Kayser. Within this region, four previously unreported lines are observed.

  5. Ferritic Alloys with Extreme Creep Resistance via Coherent Hierarchical Precipitates.

    PubMed

    Song, Gian; Sun, Zhiqian; Li, Lin; Xu, Xiandong; Rawlings, Michael; Liebscher, Christian H; Clausen, Bjørn; Poplawsky, Jonathan; Leonard, Donovan N; Huang, Shenyan; Teng, Zhenke; Liu, Chain T; Asta, Mark D; Gao, Yanfei; Dunand, David C; Ghosh, Gautam; Chen, Mingwei; Fine, Morris E; Liaw, Peter K

    2015-01-01

    There have been numerous efforts to develop creep-resistant materials strengthened by incoherent particles at high temperatures and stresses in response to future energy needs for steam turbines in thermal-power plants. However, the microstructural instability of the incoherent-particle-strengthened ferritic steels limits their application to temperatures below 900 K. Here, we report a novel ferritic alloy with the excellent creep resistance enhanced by coherent hierarchical precipitates, using the integrated experimental (transmission-electron microscopy/scanning-transmission-electron microscopy, in-situ neutron diffraction, and atom-probe tomography) and theoretical (crystal-plasticity finite-element modeling) approaches. This alloy is strengthened by nano-scaled L21-Ni2TiAl (Heusler phase)-based precipitates, which themselves contain coherent nano-scaled B2 zones. These coherent hierarchical precipitates are uniformly distributed within the Fe matrix. Our hierarchical structure material exhibits the superior creep resistance at 973 K in terms of the minimal creep rate, which is four orders of magnitude lower than that of conventional ferritic steels. These results provide a new alloy-design strategy using the novel concept of hierarchical precipitates and the fundamental science for developing creep-resistant ferritic alloys. The present research will broaden the applications of ferritic alloys to higher temperatures. PMID:26548303

  6. Ferritic Alloys with Extreme Creep Resistance via Coherent Hierarchical Precipitates

    PubMed Central

    Song, Gian; Sun, Zhiqian; Li, Lin; Xu, Xiandong; Rawlings, Michael; Liebscher, Christian H.; Clausen, Bjørn; Poplawsky, Jonathan; Leonard, Donovan N.; Huang, Shenyan; Teng, Zhenke; Liu, Chain T.; Asta, Mark D.; Gao, Yanfei; Dunand, David C.; Ghosh, Gautam; Chen, Mingwei; Fine, Morris E.; Liaw, Peter K.

    2015-01-01

    There have been numerous efforts to develop creep-resistant materials strengthened by incoherent particles at high temperatures and stresses in response to future energy needs for steam turbines in thermal-power plants. However, the microstructural instability of the incoherent-particle-strengthened ferritic steels limits their application to temperatures below 900 K. Here, we report a novel ferritic alloy with the excellent creep resistance enhanced by coherent hierarchical precipitates, using the integrated experimental (transmission-electron microscopy/scanning-transmission-electron microscopy, in-situ neutron diffraction, and atom-probe tomography) and theoretical (crystal-plasticity finite-element modeling) approaches. This alloy is strengthened by nano-scaled L21-Ni2TiAl (Heusler phase)-based precipitates, which themselves contain coherent nano-scaled B2 zones. These coherent hierarchical precipitates are uniformly distributed within the Fe matrix. Our hierarchical structure material exhibits the superior creep resistance at 973 K in terms of the minimal creep rate, which is four orders of magnitude lower than that of conventional ferritic steels. These results provide a new alloy-design strategy using the novel concept of hierarchical precipitates and the fundamental science for developing creep-resistant ferritic alloys. The present research will broaden the applications of ferritic alloys to higher temperatures. PMID:26548303

  7. Ferritic Alloys with Extreme Creep Resistance via Coherent Hierarchical Precipitates

    DOE PAGES

    Song, Gian; Sun, Zhiqian; Li, Lin; Xu, Xiandong; Rawlings, Michael; Liebscher, Christian H.; Clausen, Bjørn; Poplawsky, Jonathan; Leonard, Donovan N.; Huang, Shenyan; et al

    2015-11-09

    There have been numerous efforts to develop creep-resistant materials strengthened by incoherent particles at high temperatures and stresses in response to future energy needs for steam turbines in thermal-power plants. However, the microstructural instability of the incoherent-particle-strengthened ferritic steels limits their application to temperatures below 900 K. Here, we report a novel ferritic alloy with the excellent creep resistance enhanced by coherent hierarchical precipitates, using the integrated experimental (transmission-electron microscopy/scanning-transmission-electron microscopy, in-situ neutron diffraction, and atom-probe tomography) and theoretical (crystal-plasticity finite-element modeling) approaches. This alloy is strengthened by nano-scaled L21-Ni2TiAl (Heusler phase)-based precipitates, which themselves contain coherent nano-scaled B2 zones.more » These coherent hierarchical precipitates are uniformly distributed within the Fe matrix. Our hierarchical structure material exhibits the superior creep resistance at 973 K in terms of the minimal creep rate, which is four orders of magnitude lower than that of conventional ferritic steels. These results provide a new alloy-design strategy using the novel concept of hierarchical precipitates and the fundamental science for developing creep-resistant ferritic alloys. Finally, the present research will broaden the applications of ferritic alloys to higher temperatures.« less

  8. Ferritic Alloys with Extreme Creep Resistance via Coherent Hierarchical Precipitates

    SciTech Connect

    Song, Gian; Sun, Zhiqian; Li, Lin; Xu, Xiandong; Rawlings, Michael; Liebscher, Christian H.; Clausen, Bjørn; Poplawsky, Jonathan; Leonard, Donovan N.; Huang, Shenyan; Teng, Zhenke; Liu, Chain T.; Asta, Mark D.; Gao, Yanfei; Dunand, David C.; Ghosh, Gautam; Chen, Mingwei; Fine, Morris E.; Liaw, Peter K.

    2015-11-09

    There have been numerous efforts to develop creep-resistant materials strengthened by incoherent particles at high temperatures and stresses in response to future energy needs for steam turbines in thermal-power plants. However, the microstructural instability of the incoherent-particle-strengthened ferritic steels limits their application to temperatures below 900 K. Here, we report a novel ferritic alloy with the excellent creep resistance enhanced by coherent hierarchical precipitates, using the integrated experimental (transmission-electron microscopy/scanning-transmission-electron microscopy, in-situ neutron diffraction, and atom-probe tomography) and theoretical (crystal-plasticity finite-element modeling) approaches. This alloy is strengthened by nano-scaled L21-Ni2TiAl (Heusler phase)-based precipitates, which themselves contain coherent nano-scaled B2 zones. These coherent hierarchical precipitates are uniformly distributed within the Fe matrix. Our hierarchical structure material exhibits the superior creep resistance at 973 K in terms of the minimal creep rate, which is four orders of magnitude lower than that of conventional ferritic steels. These results provide a new alloy-design strategy using the novel concept of hierarchical precipitates and the fundamental science for developing creep-resistant ferritic alloys. Finally, the present research will broaden the applications of ferritic alloys to higher temperatures.

  9. Ferritic Alloys with Extreme Creep Resistance via Coherent Hierarchical Precipitates

    NASA Astrophysics Data System (ADS)

    Song, Gian; Sun, Zhiqian; Li, Lin; Xu, Xiandong; Rawlings, Michael; Liebscher, Christian H.; Clausen, Bjørn; Poplawsky, Jonathan; Leonard, Donovan N.; Huang, Shenyan; Teng, Zhenke; Liu, Chain T.; Asta, Mark D.; Gao, Yanfei; Dunand, David C.; Ghosh, Gautam; Chen, Mingwei; Fine, Morris E.; Liaw, Peter K.

    2015-11-01

    There have been numerous efforts to develop creep-resistant materials strengthened by incoherent particles at high temperatures and stresses in response to future energy needs for steam turbines in thermal-power plants. However, the microstructural instability of the incoherent-particle-strengthened ferritic steels limits their application to temperatures below 900 K. Here, we report a novel ferritic alloy with the excellent creep resistance enhanced by coherent hierarchical precipitates, using the integrated experimental (transmission-electron microscopy/scanning-transmission-electron microscopy, in-situ neutron diffraction, and atom-probe tomography) and theoretical (crystal-plasticity finite-element modeling) approaches. This alloy is strengthened by nano-scaled L21-Ni2TiAl (Heusler phase)-based precipitates, which themselves contain coherent nano-scaled B2 zones. These coherent hierarchical precipitates are uniformly distributed within the Fe matrix. Our hierarchical structure material exhibits the superior creep resistance at 973 K in terms of the minimal creep rate, which is four orders of magnitude lower than that of conventional ferritic steels. These results provide a new alloy-design strategy using the novel concept of hierarchical precipitates and the fundamental science for developing creep-resistant ferritic alloys. The present research will broaden the applications of ferritic alloys to higher temperatures.

  10. Design, fabrication, and characterization of high-efficiency extreme ultraviolet diffusers

    SciTech Connect

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2004-02-19

    As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such example is the diffuser often implemented with ordinary ground glass in the visible light regime. Here we demonstrate the fabrication of reflective EUV diffusers with high efficiency within a controllable bandwidth. Using these techniques we have fabricated diffusers with efficiencies exceeding 10% within a moderate angular single-sided bandwidth of approximately 0.06 radians.

  11. Two-colour pump–probe experiments with a twin-pulse-seed extreme ultraviolet free-electron laser

    PubMed Central

    Allaria, E.; Bencivenga, F.; Borghes, R.; Capotondi, F.; Castronovo, D.; Charalambous, P.; Cinquegrana, P.; Danailov, M. B.; De Ninno, G.; Demidovich, A.; Di Mitri, S.; Diviacco, B.; Fausti, D.; Fawley, W. M.; Ferrari, E.; Froehlich, L.; Gauthier, D.; Gessini, A.; Giannessi, L.; Ivanov, R.; Kiskinova, M.; Kurdi, G.; Mahieu, B.; Mahne, N.; Nikolov, I.; Masciovecchio, C.; Pedersoli, E.; Penco, G.; Raimondi, L.; Serpico, C.; Sigalotti, P.; Spampinati, S.; Spezzani, C.; Svetina, C.; Trovò, M.; Zangrando, M.

    2013-01-01

    Exploring the dynamics of matter driven to extreme non-equilibrium states by an intense ultrashort X-ray pulse is becoming reality, thanks to the advent of free-electron laser technology that allows development of different schemes for probing the response at variable time delay with a second pulse. Here we report the generation of two-colour extreme ultraviolet pulses of controlled wavelengths, intensity and timing by seeding of high-gain harmonic generation free-electron laser with multiple independent laser pulses. The potential of this new scheme is demonstrated by the time evolution of a titanium-grating diffraction pattern, tuning the two coherent pulses to the titanium M-resonance and varying their intensities. This reveals that an intense pulse induces abrupt pattern changes on a time scale shorter than hydrodynamic expansion and ablation. This result exemplifies the essential capabilities of the jitter-free multiple-colour free-electron laser pulse sequences to study evolving states of matter with element sensitivity. PMID:24048228

  12. Extreme-Ultraviolet-Initated High-Order Harmonic Generation: Driving Inner-Valence Electrons Using Below-Threshold-Energy Extreme-Ultraviolet Light.

    PubMed

    Brown, A C; van der Hart, H W

    2016-08-26

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in extreme-ultraviolet (XUV)-initiated high-harmonic generation in neon. By probing the atom with a low-energy (below the 2s ionization threshold) ultrashort XUV pulse, the 2p electron is steered away from the core, while the 2s electron is enabled to describe recollision trajectories. By selectively suppressing the 2p recollision trajectories, we can resolve the contribution of the 2s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2s electron, which allows for an intuitive understanding of the process.

  13. Extreme-Ultraviolet-Initated High-Order Harmonic Generation: Driving Inner-Valence Electrons Using Below-Threshold-Energy Extreme-Ultraviolet Light.

    PubMed

    Brown, A C; van der Hart, H W

    2016-08-26

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in extreme-ultraviolet (XUV)-initiated high-harmonic generation in neon. By probing the atom with a low-energy (below the 2s ionization threshold) ultrashort XUV pulse, the 2p electron is steered away from the core, while the 2s electron is enabled to describe recollision trajectories. By selectively suppressing the 2p recollision trajectories, we can resolve the contribution of the 2s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2s electron, which allows for an intuitive understanding of the process. PMID:27610852

  14. Extreme-Ultraviolet-Initated High-Order Harmonic Generation: Driving Inner-Valence Electrons Using Below-Threshold-Energy Extreme-Ultraviolet Light

    NASA Astrophysics Data System (ADS)

    Brown, A. C.; van der Hart, H. W.

    2016-08-01

    We propose a novel scheme for resolving the contribution of inner- and outer-valence electrons in extreme-ultraviolet (XUV)-initiated high-harmonic generation in neon. By probing the atom with a low-energy (below the 2 s ionization threshold) ultrashort XUV pulse, the 2 p electron is steered away from the core, while the 2 s electron is enabled to describe recollision trajectories. By selectively suppressing the 2 p recollision trajectories, we can resolve the contribution of the 2 s electron to the high-harmonic spectrum. We apply the classical trajectory model to account for the contribution of the 2 s electron, which allows for an intuitive understanding of the process.

  15. Continuous-wave coherent ultraviolet source at 326 nm based on frequency trippling of fiber amplifiers.

    PubMed

    Kim, Jae-Ihn; Meschede, Dieter

    2008-07-01

    We have demonstrated a tunable single frequency source of continuous-wave (CW) coherent ultraviolet (UV) radiation at lambda (3omega) = 326 nm. Laser light of a tunable diode laser at lambda(omega) = 977 nm was split and injected into two independent fiber amplifiers yielding 1 W and 0.4 W, respectively. The 1 W branch was resonantly frequency doubled, resulting in 120 mW of useful power at lambda(2omega) = 488 nm. The third harmonic was generated by summation of the second branch of lambda(omega) and lambda(2omega) which were enhanced by a doubly resonant cavity. This light source has TEM(00) character and can be continuously tuned over more than 18 GHz. It is of interest for efficient laser cooling of In and potentially other applications.

  16. Perception of the Extreme Unseen: From Mathematics to Aesthetic Coherence

    SciTech Connect

    Andersen, Jan-Henrik

    2005-06-29

    The nature of my work is to lift the veil on the optically impossible task of visually observing subatomic particles by translating the Standard Model into a coherent visual language. No one has ever seen, nor will anyone ever see, anything as small or fast as a Quark or a Neutrino; one could argue that they could look like anything, if they have looks at all. On the other hand, a translation to visual aesthetics of their properties and behavior may offer a basis for a discussion of their visual qualities. The proposal, as seen in the Fermilab Gallery, contextualizes the particles in a syntax where their properties like velocity, color, mass and spin are represented as visual elements within an order of itself. And perhaps yet more important, a visual perception of subatomic particles and their interaction makes this fantastic and beautiful world available to a broader audience.

  17. The intrinsic extreme ultraviolet fluxes of F5 V to M5 V stars

    SciTech Connect

    Linsky, Jeffrey L.; Fontenla, Juan; France, Kevin E-mail: jfontenla@nwra.com

    2014-01-01

    Extreme ultraviolet (EUV) radiations (10-117 nm) from host stars play important roles in the ionization, heating, and mass loss from exoplanet atmospheres. Together with the host star's Lyα and far-UV (117-170 nm) radiation, EUV radiation photodissociates important molecules, thereby changing the chemistry in exoplanet atmospheres. Since stellar EUV fluxes cannot now be measured and interstellar neutral hydrogen completely obscures stellar radiation between 40 and 91.2 nm, even for the nearest stars, we must estimate the unobservable EUV flux by indirect methods. New non-LTE semiempirical models of the solar chromosphere and corona and solar irradiance measurements show that the ratio of EUV flux in a variety of wavelength bands to the Lyα flux varies slowly with the Lyα flux and thus with the magnetic heating rate. This suggests and we confirm that solar EUV/Lyα flux ratios based on the models and observations are similar to the available 10-40 nm flux ratios observed with the Extreme Ultraviolet Explorer (EUVE) satellite and the 91.2-117 nm flux observed with the Far Ultraviolet Spectroscopic Explorer (FUSE) satellite for F5 V-M5 V stars. We provide formulae for predicting EUV flux ratios based on the EUVE and FUSE stellar data and on the solar models, which are essential input for modeling the atmospheres of exoplanets.

  18. Multistep Ionization of Argon Clusters in Intense Femtosecond Extreme Ultraviolet Pulses

    SciTech Connect

    Bostedt, C.; Thomas, H.; Hoener, M.; Eremina, E.; Fennel, T.; Meiwes-Broer, K.-H.; Wabnitz, H.; Kuhlmann, M.; Ploenjes, E.; Tiedtke, K.; Treusch, R.; Feldhaus, J.; Castro, A. R. B. de; Moeller, T.

    2008-04-04

    The interaction of intense extreme ultraviolet femtosecond laser pulses ({lambda}=32.8 nm) from the FLASH free electron laser (FEL) with clusters has been investigated by means of photoelectron spectroscopy and modeled by Monte Carlo simulations. For laser intensities up to 5x10{sup 13} W/cm{sup 2}, we find that the cluster ionization process is a sequence of direct electron emission events in a developing Coulomb field. A nanoplasma is formed only at the highest investigated power densities where ionization is frustrated due to the deep cluster potential. In contrast with earlier studies in the IR and vacuum ultraviolet spectral regime, we find no evidence for electron emission from plasma heating processes.

  19. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    SciTech Connect

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-15

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  20. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  1. Ablation and transmission of thin solid targets irradiated by intense extreme ultraviolet laser radiation

    NASA Astrophysics Data System (ADS)

    Aslanyan, V.; Kuznetsov, I.; Bravo, H.; Woolston, M. R.; Rossall, A. K.; Menoni, C. S.; Rocca, J. J.; Tallents, G. J.

    2016-09-01

    The interaction of an extreme ultraviolet (EUV) laser beam with a parylene foil was studied by experiments and simulation. A single EUV laser pulse of nanosecond duration focused to an intensity of 3 × 1010 W cm-2 perforated micrometer thick targets. The same laser pulse was simultaneously used to diagnose the interaction by a transmission measurement. A combination of 2-dimensional radiation-hydrodynamic and diffraction calculations was used to model the ablation, leading to good agreement with experiment. This theoretical approach allows predictive modelling of the interaction with matter of intense EUV beams over a broad range of parameters.

  2. Dynamics of laser-produced Sn microplasma for a high-brightness extreme ultraviolet light source

    SciTech Connect

    Yuspeh, S.; Tao, Y.; Burdt, R. A.; Tillack, M. S.; Ueno, Y.; Najmabadi, F.

    2011-05-16

    The effect of laser focal spot diameters of 26 and 150 {mu}m on 13.5 nm extreme ultraviolet (EUV) radiation is investigated. Simulations show that the smaller spot size has a shorter electron plasma density scale length and deeper and denser laser energy deposition region. This results in additional time required for plasma expansion and radiation transport to efficiently emit EUV light. This is experimentally observed as an increase in the delay between the EUV emission and the laser pulse. The shorter scale length plasma reabsorbs less EUV light, resulting in a higher conversion efficiency, smaller and slightly brighter light source.

  3. Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation.

    PubMed

    Higashiguchi, Takeshi; Yamaguchi, Mami; Otsuka, Takamitsu; Nagata, Takeshi; Ohashi, Hayato; Li, Bowen; D'Arcy, Rebekah; Dunne, Padraig; O'Sullivan, Gerry

    2014-09-01

    Emission spectra from multiply charged potassium ions ranging from K(3+) to K(5+) have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8-12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable. PMID:25273788

  4. Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology.

    PubMed

    Capeluto, María Gabriela; Marconi, Mario Carlos; Iemmi, Claudio Cesar

    2014-03-01

    The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. PMID:24663354

  5. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  6. Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles.

    PubMed

    Gao, A; Rizo, P J; Scaccabarozzi, L; Lee, C J; Banine, V; Bijkerk, F

    2015-06-01

    Here, we propose a comparison-free inspection technique to detect particle contamination on the reticle of extreme ultraviolet (EUV) lithography systems, based on the photoluminescence spectral characteristics of the contaminant particles and their elemental composition. We have analyzed the spectra from different particles found on reticles in EUV lithographic systems and have determined the minimum detectable particle size: 25 nm for organic particles and 100 nm for Al particles. Stainless steel coatings (50 nm thick and 50 × 50 μm(2) in area) exhibit detectable photoluminescence, and the estimated minimum detectable particle is 2 μm. PMID:26133830

  7. Evolution of laser-produced Sn extreme ultraviolet source diameter for high-brightness source

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Arai, Goki; Hara, Hiroyuki; Higashiguchi, Takeshi; Ohashi, Hayato; Sunahara, Atsushi; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Miura, Taisuke; Mocek, Tomas; Endo, Akira

    2014-08-18

    We have investigated the effect of irradiation of solid Sn targets with laser pulses of sub-ns duration and sub-mJ energy on the diameter of the extreme ultraviolet (EUV) emitting region and source conversion efficiency. It was found that an in-band EUV source diameter as low as 18 μm was produced due to the short scale length of a plasma produced by a sub-ns laser. Most of the EUV emission occurs in a narrow region with a plasma density close to the critical density value. Such EUV sources are suitable for high brightness and high repetition rate metrology applications.

  8. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

    DOEpatents

    Montcalm, Claude; Stearns, Daniel G.; Vernon, Stephen P.

    1999-01-01

    A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

  9. Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles

    NASA Astrophysics Data System (ADS)

    Gao, A.; Rizo, P. J.; Scaccabarozzi, L.; Lee, C. J.; Banine, V.; Bijkerk, F.

    2015-06-01

    Here, we propose a comparison-free inspection technique to detect particle contamination on the reticle of extreme ultraviolet (EUV) lithography systems, based on the photoluminescence spectral characteristics of the contaminant particles and their elemental composition. We have analyzed the spectra from different particles found on reticles in EUV lithographic systems and have determined the minimum detectable particle size: 25 nm for organic particles and 100 nm for Al particles. Stainless steel coatings (50 nm thick and 50 × 50 μm2 in area) exhibit detectable photoluminescence, and the estimated minimum detectable particle is 2 μm.

  10. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  11. Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range

    SciTech Connect

    Aruev, P N; Barysheva, Mariya M; Ber, B Ya; Zabrodskaya, N V; Zabrodskii, V V; Lopatin, A Ya; Pestov, Alexey E; Petrenko, M V; Polkovnikov, V N; Salashchenko, Nikolai N; Sukhanov, V L; Chkhalo, Nikolai I

    2012-10-31

    The procedure of manufacturing silicon photodiodes with an integrated Zr/Si filter for extreme ultraviolet (EUV) spectral range is developed. A setup for measuring the sensitivity profile of detectors with spatial resolution better than 100 {mu}m is fabricated. The optical properties of silicon photodiodes in the EUV and visible spectral ranges are investigated. Some characteristics of SPD-100UV diodes with Zr/Si coating and without it, as well as of AXUV-100 diodes, are compared. In all types of detectors a narrow region beyond the operating aperture is found to be sensitive to the visible light. (photodetectors)

  12. Rare-earth plasma extreme ultraviolet sources at 6.5-6.7 nm

    SciTech Connect

    Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Kilbane, Deirdre; White, John; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Endo, Akira

    2010-09-13

    We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5-6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B{sub 4}C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm (in-band: 6.7 nm {+-}1%) suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission.

  13. Extreme ultraviolet source at 6.7 nm based on a low-density plasma

    SciTech Connect

    Higashiguchi, Takeshi; Yugami, Noboru; Otsuka, Takamitsu; Jiang, Weihua; Endo, Akira; Li Bowen; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry

    2011-11-07

    We demonstrate an efficient extreme ultraviolet (EUV) source for operation at {lambda} = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

  14. Development of a Wafer Positioning System for the Sandia Extreme Ultraviolet Lithography Tool

    NASA Technical Reports Server (NTRS)

    Wronosky, John B.; Smith, Tony G.; Darnold, Joel R.

    1996-01-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  15. Exploring the temporally resolved electron density evolution in extreme ultra-violet induced plasmas

    NASA Astrophysics Data System (ADS)

    van der Horst, R. M.; Beckers, J.; Nijdam, S.; Kroesen, G. M. W.

    2014-07-01

    We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is 2.6 × 1016 m-3. This is in good agreement with a theoretical prediction from photo-ionization, which yields a density of 4.5 × 1016 m-3. After the EUV pulse the density slightly increases due to electron impact ionization. The plasma (i.e. electron density) decays in tens of microseconds.

  16. Interferometric time delay correction for Fourier transform spectroscopy in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Meng, Yijian; Zhang, Chunmei; Marceau, Claude; Naumov, A. Yu.; Corkum, P. B.; Villeneuve, D. M.

    2016-09-01

    We demonstrate a Fourier transform spectrometer in the extreme ultraviolet (XUV) spectrum using a high-harmonic source, with wavelengths as short as 32 nm. The femtosecond infrared laser source is divided into two separate foci in the same gas jet to create two synchronized XUV sources. An interferometric method to determine the relative delay between the two sources is shown to improve the accuracy of the delay time, with corrections of up to 200 asec required. By correcting the time base before the Fourier transform, the frequency resolution is improved by up to an order of magnitude.

  17. Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

    NASA Astrophysics Data System (ADS)

    Noh, J. H.; Stanford, M. G.; Lewis, B. B.; Fowlkes, J. D.; Plank, H.; Rack, P. D.

    2014-12-01

    One critical area for the adoption of extreme ultraviolet (EUV) lithography is the development of appropriate mask repair strategies. To this end, we have explored focused electron beam-induced deposition of the ruthenium capping or protective layer. Electron beam-induced deposition (EBID) was used to deposit a ruthenium capping/protective film using the liquid bis(ethylcyclopentyldienyl)ruthenium(II) precursor. The carbon to ruthenium atomic ratio in the as-deposited material was estimated to be ~9/1. Subsequent to deposition, we demonstrate an electron stimulated purification process to remove carbon by-products from the deposit. Results indicate that high-fidelity nanoscale ruthenium repairs can be realized.

  18. Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography

    SciTech Connect

    Rao, V.; Hutchinson, J.; Holl, S.; Langston, J.; Henderson, C.; Wheeler, D.R.; Cardinale, G.; OConnell, D.; Goldsmith, J.; Bohland, J.; Taylor, G.; Sinta, R.

    1998-11-01

    The maturity and acceptance of top surface imaging (TSI) technology have been hampered by several factors including inadequate resist sensitivity and line edge roughness. We have found that the use of a chemically amplified resist can improve the sensitivity in these systems by 1.5{endash} 2{times} without compromising the line edge roughness. In addition, we have shown improved line edge roughness by increasing the molecular weight of the polymeric resin in the resist. Using these materials approaches, we have been able to show excellent resolution images with the TSI process for both 193 nm and extreme ultraviolet (13.4 nm) patterning. {copyright} {ital 1998 American Vacuum Society.}

  19. Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

    SciTech Connect

    Higashiguchi, Takeshi Yamaguchi, Mami; Otsuka, Takamitsu; Nagata, Takeshi; Ohashi, Hayato; Li, Bowen; D’Arcy, Rebekah; Dunne, Padraig; O’Sullivan, Gerry

    2014-09-15

    Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

  20. Attosecond extreme ultraviolet generation in cluster by using spatially inhomogeneous field

    SciTech Connect

    Feng, Liqiang; Liu, Hang

    2015-01-15

    A promising method to generate the attosecond extreme ultraviolet (XUV) sources has been theoretically investigated emerging from the two-dimensional Ar{sup +} cluster driven by the spatially inhomogeneous field. The results show that with the introduction of the Ar{sup +} cluster model, not only the harmonic cutoffs are enhanced, but also the harmonic yields are reinforced. Furthermore, by properly moderating the inhomogeneity as well as the laser parameters of the inhomogeneous field, the harmonic cutoff can be further extended. As a result, three almost linearly polarized XUV pulses with durations of 40 as, 42 as, and 45 as can be obtained.

  1. High resolution extreme ultraviolet spectrometer for an electron beam ion trap

    SciTech Connect

    Ohashi, Hayato; Yatsurugi, Junji; Nakamura, Nobuyuki; Sakaue, Hiroyuki A.

    2011-08-15

    An extreme ultraviolet spectrometer has been developed for spectroscopic studies of highly charged ions with an electron beam ion trap. It has a slit-less configuration with a spherical varied-line-spacing grating that provides a flat focal plane for grazing incidence light. Alternative use of two different gratings enables us to cover the wavelength range 1-25 nm. Test observations with the Tokyo electron beam ion trap demonstrate the high performance of the present spectrometer such as a resolving power of above 1000.

  2. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool

    SciTech Connect

    Wronosky, J.B.; Smith, T.G.; Darnold, J.R.

    1995-12-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  3. Design, fabrication and performance of two grazing incidence telescopes for celestial extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Lampton, M.; Cash, W.; Malina, R. F.; Bowyer, S.

    1977-01-01

    The design and performance of grazing incidence telescopes for celestial extreme ultraviolet (EUV) astronomy are described. The telescopes basically consist of a star tracker, collimator, grazing incidence mirror, vacuum box lid, vacuum housing, filters, a ranicon detector, an electronics box, and an aspect camera. For the survey mirror a Wolter-Schwarzschild type II configuration was selected. Diamond-turning was used for mirror fabrication, a technique which machines surfaces to the order of 10 microns over the required dimensions. The design of the EUV spectrometer is discussed with particular reference to the optics for a primarily spectroscopic application and the fabrication of the f/10 optics.

  4. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  5. High-efficiency collector design for extreme-ultraviolet and x-ray applications.

    PubMed

    Zocchi, Fabio E

    2006-12-10

    A design of a two-reflection mirror for nested grazing-incidence optics is proposed in which maximum overall reflectivity is achieved by making the two grazing-incidence angles equal for each ray. The design is proposed mainly for application to nonimaging collector optics for extreme-ultraviolet microlithography where the radiation emitted from a hot plasma source needs to be collected and focused on the illuminator optics. For completeness, the design of a double- reflection mirror with equal reflection angles is also briefly outlined for the case of an object at infinity for possible use in x-ray applications.

  6. High-efficiency collector design for extreme-ultraviolet and x-ray applications

    SciTech Connect

    Zocchi, Fabio E

    2006-12-10

    A design of a two-reflection mirror for nested grazing-incidence optics is proposed in which maximum overall reflectivity is achieved by making the two grazing-incidence angles equal for each ray. The design is proposed mainly for application to nonimaging collector optics for extreme-ultraviolet microlithography where the radiation emitted from a hot plasma source needs to be collected and focused on the illuminator optics. For completeness, the design of a double-reflection mirror with equal reflection angles is also briefly outlined for the case of an object at infinity for possible use in x-ray applications.

  7. High-efficiency collector design for extreme-ultraviolet and x-ray applications.

    PubMed

    Zocchi, Fabio E

    2006-12-10

    A design of a two-reflection mirror for nested grazing-incidence optics is proposed in which maximum overall reflectivity is achieved by making the two grazing-incidence angles equal for each ray. The design is proposed mainly for application to nonimaging collector optics for extreme-ultraviolet microlithography where the radiation emitted from a hot plasma source needs to be collected and focused on the illuminator optics. For completeness, the design of a double- reflection mirror with equal reflection angles is also briefly outlined for the case of an object at infinity for possible use in x-ray applications. PMID:17119587

  8. EIT: Solar corona synoptic observations from SOHO with an Extreme-ultraviolet Imaging Telescope

    NASA Technical Reports Server (NTRS)

    Delaboudiniere, J. P.; Gabriel, A. H.; Artzner, G. E.; Michels, D. J.; Dere, K. P.; Howard, R. A.; Catura, R.; Stern, R.; Lemen, J.; Neupert, W.

    1988-01-01

    The Extreme-ultraviolet Imaging Telescope (EIT) of SOHO (solar and heliospheric observatory) will provide full disk images in emission lines formed at temperatures that map solar structures ranging from the chromospheric network to the hot magnetically confined plasma in the corona. Images in four narrow bandpasses will be obtained using normal incidence multilayered optics deposited on quadrants of a Ritchey-Chretien telescope. The EIT is capable of providing a uniform one arc second resolution over its entire 50 by 50 arc min field of view. Data from the EIT will be extremely valuable for identifying and interpreting the spatial and temperature fine structures of the solar atmosphere. Temporal analysis will provide information on the stability of these structures and identify dynamical processes. EIT images, issued daily, will provide the global corona context for aid in unifying the investigations and in forming the observing plans for SOHO coronal instruments.

  9. Spin-on-glass coatings for the generation of super-polishedsubstrates for extreme ultraviolet optics

    SciTech Connect

    Salmassi, Farhad; Naulleau, Patrick P.; Gullikson, Eric M.

    2005-01-01

    Substrates intended for use as extreme ultraviolet (EUV) optics have extremely stringent requirements in terms of finish. These requirements can dramatically increase the cost and fabrication time, especially when non-conventional shapes, such as toroids, are required. Here we present a spin-on-glass resist process capable of generating super-polished parts from inexpensive substrates. The method has been used to render diamond-turned substrates compatible for use as EUV optics. Toroidal diamond-turned optics with starting rms roughness in the 3.3 to 3.7 nm range have been smoothed to the 0.4 to 0.6 nm range. EUV reflectometry characterization of these optics has demonstrated reflectivities of approximately 63%.

  10. Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing

    SciTech Connect

    Ray-Chaudhuri, A.K.; Ng, W.; Cerrina, F.; Tan, Z.; Bjorkholm, J.; Tennant, D.; Spector, S.J.

    1995-11-01

    Multilayer-coated imaging systems for extreme ultraviolet (EUV) lithography at 13 nm represent a significant challenge for alignment and characterization. The standard practice of utilizing visible light interferometry fundamentally provides an incomplete picture since this technique fails to account for phase effects induced by the multilayer coating. Thus the development of optical techniques at the functional EUV wavelength is required. We present the development of two EUV optical tests based on Foucault and Ronchi techniques. These relatively simple techniques are extremely sensitive due to the factor of 50 reduction in wavelength. Both techniques were utilized to align a Mo--Si multilayer-coated Schwarzschild camera. By varying the illumination wavelength, phase shift effects due to the interplay of multilayer coating and incident angle were uniquely detected. {copyright} {ital 1995} {ital American} {ital Vacuum} {ital Society}

  11. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Géneaux, R.; Camper, A.; Auguste, T.; Gobert, O.; Caillat, J.; Taïeb, R.; Ruchon, T.

    2016-08-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices.

  12. EXTREME ULTRAVIOLET EXPLORER OBSERVATIONS OF HERCULES X-1 OVER A 35 DAY CYCLE

    SciTech Connect

    Leahy, D. A.; Dupuis, Jean

    2010-06-01

    Observations of Hercules X-1 by the Extreme Ultraviolet Explorer covering most of the 35 day cycle are reported here. This is the only long extreme ultraviolet (EUV) observation of Her X-1. Simultaneous X-ray observations with the Rossi X-ray Timing Explorer All-Sky Monitor (RXTE/ASM) X-ray show that Her X-1 is in an X-ray anomalous low state. The first 4 days are also observed with the RXTE proportional counter array (PCA), which shows that the X-ray properties are nearly the same as for normal low states in Her X-1 with flux reduced by a factor of 2. In contrast, the EUV emission from Her X-1 is reduced by a factor of {approx}4 compared to normal low states. The twisted-tilted accretion disk responsible for the normal 35 day X-ray cycle can be modified to explain this behavior. An increased disk twist reduces the X-ray illumination of HZ Her by a factor of {approx}2 and of the disk surface by a somewhat larger factor, leading to a larger reduction in EUV flux compared to X-ray flux.

  13. Detection of rotational modulation in the coronal extreme-ultraviolet emission from V711 Tauri?

    PubMed

    Drake, J J; Brown, A; Patterer, R J; Vedder, P W; Bowyer, S; Guinan, E F

    1994-01-20

    The RS CVn binary V711 Tauri was observed by the Extreme Ultraviolet Explorer satellite (EUVE) twice during the latter half of 1992, for periods lasting several days. Light curves for the waveband 60-180 angstroms derived from the all-sky survey scanning in August and from a pointed calibration observation made in October both exhibit a modulation of about 40%. The modulation in both data sets is very similar, with minimum flux occurring near orbital phase phi=0.5. Analysis using a two-temperature optically thin plasma emission model reveals that most of the detected extreme ultraviolet (EUV) flux emanates from hot (approximately 10(7) K) coronal plasma. The modulation is probably mostly due to either flare-like activity or to rotational occultation of a long-lived, compact, and especially bright coronal structure on the more active star of the system. The phased data support the latter hypothesis. This coronal structure is then likely to be associated with the persistent spot patterns seen on V711 Tau when using Doppler and photometric surface imaging techniques. Comparison with contemporaneous Stromgren b-band photometry indicates that the optical minimum light leads the EUV maximum light by 90 degrees in phase.

  14. Optics and mechanisms for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B satellite.

    PubMed

    Korendyke, Clarence M; Brown, Charles M; Thomas, Roger J; Keyser, Christian; Davila, Joseph; Hagood, Robert; Hara, Hirohisa; Heidemann, Klaus; James, Adrian M; Lang, James; Mariska, John T; Moser, John; Moye, Robert; Myers, Steven; Probyn, Brian J; Seely, John F; Shea, John; Shepler, Ed; Tandy, Jason

    2006-12-01

    The Extreme-Ultraviolet Imaging Spectrometer (EIS) is the first of a new generation of normal-incidence, two-optical-element spectroscopic instruments developed for space solar extreme-ultraviolet astronomy. The instrument is currently mounted on the Solar-B satellite for a planned launch in late 2006. The instrument observes in two spectral bands, 170-210 A and 250-290 A. The spectrograph geometry and grating prescription were optimized to obtain excellent imaging while still maintaining readily achievable physical and fabrication tolerances. A refined technique using low ruling density surrogate gratings and optical metrology was developed to align the instrument with visible light. Slit rasters of the solar surface are obtained by mechanically tilting the mirror. A slit exchange mechanism allows selection among four slits at the telescope focal plane. Each slit is precisely located at the focal plane. The spectrograph imaging performance was optically characterized in the laboratory. The resolution was measured using the Mg iii and Ne iii lines in the range of 171-200 A. The He ii line at 256 A and Ne iii lines were used in the range of 251-284 A. The measurements demonstrate an equivalent resolution of ~2 arc sec? on the solar surface, in good agreement with the predicted performance. We describe the EIS optics, mechanisms, and measured performance.

  15. Breaking DNA strands by extreme-ultraviolet laser pulses in vacuum.

    PubMed

    Nováková, Eva; Vyšín, Luděk; Burian, Tomáš; Juha, Libor; Davídková, Marie; Múčka, Viliam; Čuba, Václav; Grisham, Michael E; Heinbuch, Scott; Rocca, Jorge J

    2015-04-01

    Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugars, and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. We have studied the nature of DNA damage induced directly by the pulsed 46.9-nm (26.5 eV) radiation provided by an extreme ultraviolet (XUV) capillary-discharge Ne-like Ar laser (CDL). Doses up to 45 kGy were delivered with a repetition rate of 3 Hz. We studied the dependence of the yield of SSBs and DSBs of a simple model of DNA molecule (pBR322) on the CDL pulse fluence. Agarose gel electrophoresis method was used for determination of both SSB and DSB yields. The action cross sections of the single- and double-strand breaks of pBR322 plasmid DNA in solid state were determined. We observed an increase in the efficiency of strand-break induction in the supercoiled DNA as a function of laser pulse fluence. Results are compared to those acquired at synchrotron radiation facilities and other sources of extreme-ultraviolet and soft x-ray radiation.

  16. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

    SciTech Connect

    Bajt, S; Clift, W M; Folta, J A; Gullikson, E M; Klebanoff, L E; Kleineberg, U; Malinowski, M E; Wedowski, M

    1999-08-05

    Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination

  17. Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2014-08-15

    Photon sources produced by laser beams with moderate laser intensities, up to 10{sup 14 }W/cm{sup 2}, are being developed for many industrial applications. The performance requirements for high volume manufacture devices necessitate extensive experimental research supported by theoretical plasma analysis and modeling predictions. We simulated laser produced plasma sources currently being developed for several applications such as extreme ultraviolet lithography using 13.5% ± 1% nm bandwidth, possibly beyond extreme ultraviolet lithography using 6.× nm wavelengths, and water-window microscopy utilizing 2.48 nm (La-α) and 2.88 nm (He-α) emission. We comprehensively modeled plasma evolution from solid/liquid tin, gadolinium, and nitrogen targets as three promising materials for the above described sources, respectively. Results of our analysis for plasma characteristics during the entire course of plasma evolution showed the dependence of source conversion efficiency (CE), i.e., laser energy to photons at the desired wavelength, on plasma electron density gradient. Our results showed that utilizing laser intensities which produce hotter plasma than the optimum emission temperatures allows increasing CE for all considered sources that, however, restricted by the reabsorption processes around the main emission region and this restriction is especially actual for the 6.× nm sources.

  18. LARGE-SCALE EXTREME-ULTRAVIOLET DISTURBANCES ASSOCIATED WITH A LIMB CORONAL MASS EJECTION

    SciTech Connect

    Dai, Y.; Auchere, F.; Vial, J.-C.; Tang, Y. H.; Zong, W. G.

    2010-01-10

    We present composite observations of a coronal mass ejection (CME) and the associated large-scale extreme-ultraviolet (EUV) disturbances on 2007 December 31 by the Extreme-ultraviolet Imager (EUVI) and COR1 coronagraph on board the recent Solar Terrestrial Relations Observatory mission. For this limb event, the EUV disturbances exhibit some typical characteristics of EUV Imaging Telescope waves: (1) in the 195 A bandpass, diffuse brightenings are observed propagating oppositely away from the flare site with a velocity of approx260 km s{sup -1}, leaving dimmings behind; (2) when the brightenings encounter the boundary of a polar coronal hole, they stop there to form a stationary front. Multi-temperature analysis of the propagating EUV disturbances favors a heating process over a density enhancement in the disturbance region. Furthermore, the EUVI-COR1 composite display shows unambiguously that the propagation of the diffuse brightenings coincides with a large lateral expansion of the CME, which consequently results in a double-loop-structured CME leading edge. Based on these observational facts, we suggest that the wave-like EUV disturbances are a result of magnetic reconfiguration related to the CME liftoff rather than true waves in the corona. Reconnections between the expanding CME magnetic field lines and surrounding quiet-Sun magnetic loops account for the propagating diffuse brightenings; dimmings appear behind them as a consequence of volume expansion. X-ray and radio data provide us with complementary evidence.

  19. Breaking DNA strands by extreme-ultraviolet laser pulses in vacuum

    NASA Astrophysics Data System (ADS)

    Nováková, Eva; Vyšín, Luděk; Burian, Tomáš; Juha, Libor; Davídková, Marie; Múčka, Viliam; Čuba, Václav; Grisham, Michael E.; Heinbuch, Scott; Rocca, Jorge J.

    2015-04-01

    Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugars, and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. We have studied the nature of DNA damage induced directly by the pulsed 46.9-nm (26.5 eV) radiation provided by an extreme ultraviolet (XUV) capillary-discharge Ne-like Ar laser (CDL). Doses up to 45 kGy were delivered with a repetition rate of 3 Hz. We studied the dependence of the yield of SSBs and DSBs of a simple model of DNA molecule (pBR322) on the CDL pulse fluence. Agarose gel electrophoresis method was used for determination of both SSB and DSB yields. The action cross sections of the single- and double-strand breaks of pBR322 plasmid DNA in solid state were determined. We observed an increase in the efficiency of strand-break induction in the supercoiled DNA as a function of laser pulse fluence. Results are compared to those acquired at synchrotron radiation facilities and other sources of extreme-ultraviolet and soft x-ray radiation.

  20. AN AUTOMATIC DETECTION METHOD FOR EXTREME-ULTRAVIOLET DIMMINGS ASSOCIATED WITH SMALL-SCALE ERUPTION

    SciTech Connect

    Alipour, N.; Safari, H.; Innes, D. E.

    2012-02-10

    Small-scale extreme-ultraviolet (EUV) dimming often surrounds sites of energy release in the quiet Sun. This paper describes a method for the automatic detection of these small-scale EUV dimmings using a feature-based classifier. The method is demonstrated using sequences of 171 Angstrom-Sign images taken by the STEREO/Extreme UltraViolet Imager (EUVI) on 2007 June 13 and by Solar Dynamics Observatory/Atmospheric Imaging Assembly on 2010 August 27. The feature identification relies on recognizing structure in sequences of space-time 171 Angstrom-Sign images using the Zernike moments of the images. The Zernike moments space-time slices with events and non-events are distinctive enough to be separated using a support vector machine (SVM) classifier. The SVM is trained using 150 events and 700 non-event space-time slices. We find a total of 1217 events in the EUVI images and 2064 events in the AIA images on the days studied. Most of the events are found between latitudes -35 Degree-Sign and +35 Degree-Sign . The sizes and expansion speeds of central dimming regions are extracted using a region grow algorithm. The histograms of the sizes in both EUVI and AIA follow a steep power law with slope of about -5. The AIA slope extends to smaller sizes before turning over. The mean velocity of 1325 dimming regions seen by AIA is found to be about 14 km s{sup -1}.

  1. Laboratory calibration of the Extreme-Ultraviolet Imaging Spectrometer for the Solar-B satellite

    SciTech Connect

    Lang, James; Kent, Barry J.; Paustian, Wolfgang; Brown, Charles M.; Keyser, Christian; Anderson, Mark R.; Case, Giles C. R.; Chaudry, Rahil A.; James, Adrian M.; Korendyke, Clarence M.; Pike, C. David; Probyn, Brian J.; Rippington, David J.; Seely, John F.; Tandy, Jason A.; Whillock, Matthew C. R

    2006-12-01

    The laboratory end-to-end testing of the Extreme-Ultraviolet Imaging Spectrometer (EIS) for the Solar-B satellite is reported. A short overview of the EIS, which observes in two bands in the extreme-ultraviolet wavelength range, is given. The calibration apparatus is described, including details of the light sources used.The data reduction and analysis procedure are outlined. The wavelength calibration using a Penning source to illuminate the aperture fully is presented. We discuss the aperture determination using a radiometrically calibrated hollow-cathode-based source. We then give an account of the predicted and measured efficiencies from consideration of the efficiencies of individual optical elements in first order, an account of efficiencies out of band when radiation incident in one band is detected in the other, and efficiencies in multiple orders. The efficiencies measured in first order for in band and out of band are compared with the predictions and the sensitivity, and its uncertainties are derived. Application of the radiometric calibration is discussed.

  2. Laboratory calibration of the Extreme-Ultraviolet Imaging Spectrometer for the Solar-B satellite.

    PubMed

    Lang, James; Kent, Barry J; Paustian, Wolfgang; Brown, Charles M; Keyser, Christian; Anderson, Mark R; Case, Giles C R; Chaudry, Rahil A; James, Adrian M; Korendyke, Clarence M; Pike, C David; Probyn, Brian J; Rippington, David J; Seely, John F; Tandy, Jason A; Whillock, Matthew C R

    2006-12-01

    The laboratory end-to-end testing of the Extreme-Ultraviolet Imaging Spectrometer (EIS) for the Solar-B satellite is reported. A short overview of the EIS, which observes in two bands in the extreme-ultraviolet wavelength range, is given. The calibration apparatus is described, including details of the light sources used. The data reduction and analysis procedure are outlined. The wavelength calibration using a Penning source to illuminate the aperture fully is presented. We discuss the aperture determination using a radiometrically calibrated hollow-cathode-based source. We then give an account of the predicted and measured efficiencies from consideration of the efficiencies of individual optical elements in first order, an account of efficiencies out of band when radiation incident in one band is detected in the other, and efficiencies in multiple orders. The efficiencies measured in first order for in band and out of band are compared with the predictions and the sensitivity, and its uncertainties are derived. Application of the radiometric calibration is discussed.

  3. 13 Years of SOHO/CELIAS/SEM Calibrated Solar Extreme Ultraviolet Irradiance Data

    NASA Astrophysics Data System (ADS)

    Judge, D.; Didkovsky, L.; Wieman, S.; Gangopadhyay, P.

    2008-12-01

    A verified and updated version of the calibrated SOHO/CELIAS/SEM (absolute) solar extreme ultraviolet (EUV) measurements from the beginning of the mission in 1996 through the present is available at the University of Southern California Space Sciences Center website. To complete this new version, six (1999- 2006) sounding rocket under-flights were analyzed using measurements from both a very stable Rare Gas (Ne) Ionization Cell (RGIC) and a clone of the flight SEM instrument. These sounding rocket under-flights have provided a number of reference points that have been compared with the solar flux data published on our web site (last revised in 2000). These reference points are in good agreement with the solar cycle EUV flux for the 30.4 nm first order (26 nm to 34 nm) SEM channels, indicating a very small (less than 1 percent) averaged difference from the published flux for the six under-flights. Thirteen years of continuous and accurate SEM data will continue to provide important information about short term (solar flares) and long term (solar cycle) changes of EUV solar irradiance, and will be used for advancing solar models, for more accurate Earth atmosphere drag models, ionization proxies, and atmospheric dynamics generally, and will also provide solar EUV measurement overlap with the new SDO Extreme ultraviolet Variability Experiment (EVE), to be launched in 2009.

  4. Extreme ultraviolet single-crystal diamond detectors by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Balducci, A.; Marinelli, Marco; Milani, E.; Morgada, M. E.; Tucciarone, A.; Verona-Rinati, G.; Angelone, M.; Pillon, M.

    2005-05-01

    High-quality single-crystal diamond films, homoepitaxially grown by microwave chemical vapor deposition, have been used to produce diamond-based photodetectors. Such devices were tested over a very wide spectral range, from the extreme ultraviolet (UV) (20 nm) up to the near IR region (2400 nm). An optical parametric oscillator tunable laser was used to investigate the 210-2400 nm spectral range in pulse mode. In this region, the spectral response shows a UV to visible contrast of about 6 orders of magnitude. A time response shorter than 5 ns, i.e., the laser pulse duration, was observed. By integrating the pulse shape, a minor slow component was evidenced, which can be explained in terms of trapping-detrapping effects. Extreme UV gas sources and a toroidal grating vacuum monochromator were used to measure the device response down to 20 nm in continuous mode. In particular, the extreme UV He spectrum was measured and the He II m, 30.4 nmand He I 58.4 nm emission lines were clearly detected. The measured time response of 0.2 s is totally due to the instrumental readout time constants. In both experimental setups an extremely good stability and reproducibility of the device response were obtained, whereas no persistent photoconductivity nor undesirable pumping effects were observed.

  5. Quantitative optical coherence tomography of skin lesions induced by different ultraviolet B sources

    NASA Astrophysics Data System (ADS)

    Liu, Zhiming; Guo, Zhouyi; Zhuang, Zhengfei; Zhai, Juan; Xiong, Honglian; Zeng, Changchun

    2010-10-01

    Ultraviolet B (UVB) has been widely used in dermatological phototherapy. Narrowband UVB (NB-UVB), with a peak at 311 nm, is considered to be more effective than broadband UVB (BB-UVB). However, the safety of NB-UVB is controversial. In this study, we first introduced optical coherence tomography (OCT), a novel, non-invasive in vivo imaging technology, to assess the effect of NB-UVB and BB-UVB on skin. Balb/c mice dorsal skin was exposed with increasing UVB doses (1MED, 3MEDs and 5MEDs), and then OCT images of the tissues were obtained by an OCT system with 1310 nm central wavelength. Quantitative parameters (skin thickness, disruption of the entrance signal and correlation coefficient) were extracted from the OCT images. The data indicated that NB-UVB-induced skin lesions were similar to that of BB-UVB at 1MED or 3MEDs UVB. However, the skin tissues exposed with 5MEDs NB-UVB suffered from more lesions than BB-UVB. Furthermore, the persistence of skin inflammation in 3MEDs NB-UVB-induced skin tissues was much longer than that of BB-UVB (P = 0.004). In conclusion, optimized treatment time and frequency as well as close clinical monitoring should be undertaken to reduce the latent risk of NB-UVB phototherapy.

  6. Acute skin lesions following psoralen plus ultraviolet A radiation investigated by optical coherence tomography

    NASA Astrophysics Data System (ADS)

    Liu, Z. M.; Zhong, H. Q.; Zhai, J.; Wang, C. X.; Xiong, H. L.; Guo, Z. Y.

    2013-08-01

    Psoralen plus ultraviolet A radiation (PUVA) therapy is a very important clinical treatment of skin diseases such as vitiligo and psoriasis, but associated with an increased risk of skin photodamage, especially photoaging. In this work, optical coherence tomography (OCT), a novel non-invasive imaging technology, was introduced to investigate in vivo the photodamage induced by PUVA qualitatively and quantitatively. Balb/c mouse dorsal skin was treated with 8-methoxypsoralen (8-MOP), and then exposed to UVA radiation. OCT images of the tissues were obtained by an OCT system with a 1310 nm central wavelength. Skin thickness and the attenuation coefficient were extracted from the OCT images to analyze the degree of injury to mouse skin. The results demonstrated that PUVA-treated skin showed an increase in skin thickness, and a reduction of attenuation coefficient in the OCT signal compared with the control groups. The data also showed good correlation with the results observed in histological sections using hematoxylin and eosin staining. In conclusion, OCT is a promising tool for photobiological studies aimed at assessing the effect of PUVA therapy in vivo.

  7. Resonantly enhanced method for generation of tunable, coherent vacuum ultraviolet radiation

    DOEpatents

    Glownia, James H.; Sander, Robert K.

    1985-01-01

    Carbon Monoxide vapor is used to generate coherent, tunable vacuum ultraviolet radiation by third-harmonic generation using a single tunable dye laser. The presence of a nearby electronic level resonantly enhances the nonlinear susceptibility of this molecule allowing efficient generation of the vuv light at modest pump laser intensities, thereby reducing the importance of a six-photon multiple-photon ionization process which is also resonantly enhanced by the same electronic level but to higher order. By choosing the pump radiation wavelength to be of shorter wavelength than individual vibronic levels used to extend tunability stepwise from 154.4 to 124.6 nm, and the intensity to be low enough, multiple-photon ionization can be eliminated. Excitation spectra of the third-harmonic emission output exhibit shifts to shorter wavelength and broadening with increasing CO pressure due to phase matching effects. Increasing the carbon monoxide pressure, therefore, allows the substantial filling in of gaps arising from the stepwise tuning thereby providing almost continuous tunability over the quoted range of wavelength emitted.

  8. Resonantly enhanced method for generation of tunable, coherent vacuum-ultraviolet radiation

    DOEpatents

    Glownia, J.H.; Sander, R.K.

    1982-06-29

    Carbon Monoxide vapor is used to generate coherent, tunable vacuum ultraviolet radiation by third-harmonic generation using a single tunable dye laser. The presence of a nearby electronic level resonantly enhances the nonlinear susceptibility of this molecule allowing efficient generation of the vuv light at modest pump laser intensities, thereby reducing the importance of a six-photon multiple-photon ionization process which is also resonantly enhanced by the same electronic level but no higher order. By choosing the pump radiation wavelength to be of shorter wavelength than individual vibronic levels used to extend tunability stepwise from 154.4 to 124.6 nm, and the intensity to be low enough, multiple-photon ionization can be eliminated. Excitation spectra of the third-harmonic emission output exhibit shifts to shorter wavelength and broadening with increasing CO pressure due to phase matching effects. Increasing the carbon monoxide pressure, therefore, allows the substantial filling in of gaps arising from the stepwise tuning thereby providing almost continuous tunability over the quoted range of wavelength emitted.

  9. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    SciTech Connect

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  10. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    PubMed Central

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-01-01

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. Here, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s−1 is generated at 22.3 eV, with 5 × 10−5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications. PMID:26067922

  11. Photoionization capable, extreme and vacuum ultraviolet emission in developing low temperature plasmas in air

    NASA Astrophysics Data System (ADS)

    Stephens, J.; Fierro, A.; Beeson, S.; Laity, G.; Trienekens, D.; Joshi, R. P.; Dickens, J.; Neuber, A.

    2016-04-01

    Experimental observation of photoionization capable extreme ultraviolet and vacuum ultraviolet emission from nanosecond timescale, developing low temperature plasmas (i.e. streamer discharges) in atmospheric air is presented. Applying short high voltage pulses enabled the observation of the onset of plasma formation exclusively by removing the external excitation before spark development was achieved. Contrary to the common assumption that radiative transitions from the b{{}1}{{\\Pi}u} (Birge-Hopfield I) and b{{}\\prime 1}Σu+ (Birge-Hopfield II) singlet states of N2 are the primary contributors to photoionization events, these results indicate that radiative transitions from the c{{4\\prime}1}Σu+ (Carroll-Yoshino) singlet state of N2 are dominant in developing low temperature plasmas in air. In addition to c{}4\\prime transitions, photoionization capable transitions from atomic and singly ionized atomic oxygen were also observed. The inclusion of c{{4\\prime}1}Σu+ transitions into a statistical photoionization model coupled with a fluid model enabled streamer growth in the simulation of positive streamers.

  12. Determination of the coherence length in the vacuum-ultraviolet spectral region for the BPO4 crystal

    NASA Astrophysics Data System (ADS)

    Zhang, Xin; Wang, Guiling; Zhang, Shufeng; Zhang, Erpan; Wang, Lirong; Zhu, Yong; Wu, Yicheng; Chen, Chuangtian

    2012-03-01

    An experimental system has been set up to determine the coherence lengths of nonlinear optical crystals in the vacuum-ultraviolet (VUV) spectral region by measuring the Maker fringes in the VUV region. Using this system, the Maker fringes generated by frequency conversion from 354.7 to 177.3 nm in the BPO4 crystal were obtained and the coherence length corresponding to the nonlinear optical (NLO) coefficient d36 of the BPO4 crystal was determined to be lc(d36) = (0.785 ± 0.002) μm. To the best of our knowledge, this is the first time that the coherence length of NLO crystals in VUV was determined by experiment, and the result could be an essential parameter for designing a quasi-phase-matched BPO4 device.

  13. Tin laser-produced plasma source modeling at 13.5 nm for extreme ultraviolet lithography

    SciTech Connect

    White, J.; O'Sullivan, G.; Zakharov, S.; Choi, P.; Zakharov, V.; Nishimura, H.; Fujioka, S.; Nishihara, K.

    2008-04-14

    Extreme ultraviolet lithography semiconductor manufacturing requires a 13.5 nm light source. Laser-produced plasma emission from Sn V-Sn XIV ions is one proposed industry solution. The effect of laser pulse width and spatial profile on conversion efficiency is analyzed over a range of power densities using a two-dimensional radiative magnetohydrodynamic code and compared to experiment using a 1.064 {mu}m, neodymium:yttrium aluminium garnet laser on a planar tin target. The calculated and experimental conversion efficiencies and the effects of self-absorption in the plasma edge are compared. Best agreement between theory and experiment is found for an 8.0 ns Gaussian pulse.

  14. Extreme ultraviolet diagnostics of preformed plasma in laser-driven proton acceleration experiments

    SciTech Connect

    Ragozin, Eugene N.; Pirozhkov, Alexander S.; Yogo, Akifumi; Ma Jinglong; Ogura, Koichi; Orimo, Satoshi; Sagisaka, Akito; Mori, Michiaki; Li, Zhong; Nishiuchi, Mamiko; Daido, Hiroyuki

    2006-12-15

    Proton acceleration experiments involving a 5 {mu}m thick Ti foil target irradiation are carried out with the femtosecond Ti:sapphire laser JLITE-X. The plasma emission at 13.5 nm is recorded employing concave multilayer mirrors, which image the front- and rear-side plasmas onto the sensitive surfaces of a fast x-ray photodiode and a backside-illuminated charge coupled device. Online time-of-flight fast-particle measurements are performed simultaneously with the extreme ultraviolet (XUV) measurements. A strong correlation is observed between the energetic proton signal and the spatiotemporal behavior of the XUV plasma emission. In particular, the longer duration of the prepulse-produced XUV plasma emission indicates a lowering of the maximum proton energy. This allows using the XUV emission for the diagnostics of the high-intensity laser-solid-target interaction.

  15. Analysis of observational data from Extreme Ultra-Violet Camera onboard Chang'E-3 mission

    NASA Astrophysics Data System (ADS)

    Yan, Yan; Wang, Hua-Ning; He, Han; He, Fei; Chen, Bo; Feng, Jian-Qing; Ping, Jin-Song; Shen, Chao; Xu, Rong-Lan; Zhang, Xiao-Xin

    2016-02-01

    The Extreme Ultra-Violet Camera (hereafter EUVC) is a scientific payload onboard the lander of the Chang'E-3 (hereafter CE-3) mission launched on December 1st, 2013. Centering on a spectral band around 30.4 nm, EUVC provides the global images of the Earth's plasmasphere from the meridian view, with a spatial resolution of 0.1 R_{oplus} in 150 × 150 pixels and a cadence of 10 minutes. Along with the data being publicly released online, some unsettled issues in the early stage have been clarified, including the geometrical preparations, the refined approach on the coefficient K for the background, and the alignment among the images. A demo of data after all the above processes is therefore presented as a guidance for users who are studying the structure and dynamics of the plasmasphere.

  16. Enhancement of laser plasma extreme ultraviolet emission by shockwave-laser interaction

    SciTech Connect

    Bruijn, Rene de; Koshelev, Konstantin N.; Zakharov, Serguei V.; Novikov, Vladimir G.; Bijkerk, Fred

    2005-04-15

    A double laser pulse heating scheme has been applied to generate plasmas with enhanced emission in the extreme ultraviolet (EUV). The plasmas were produced by focusing two laser beams (prepulse and main pulse) with a small spatial separation between the foci on a xenon gas jet target. Prepulses with ps-duration were applied to obtain high shockwave densities, following indications of earlier published results obtained using ns prepulses. EUV intensities around 13.5 nm and in the range 5-20 nm were recorded, and a maximum increase in intensity exceeding 2 was measured at an optimal delay of 140 ns between prepulse and main pulse. The gain in intensity is explained by the interaction of the shockwave produced by the prepulse with the xenon in the beam waist of the main pulse. Extensive simulation was done using the radiative magnetohydrodynamic code Z{sup *}.

  17. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption.

    PubMed

    Sun, J Q; Cheng, X; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-06-26

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin.

  18. Observation of molecular hyperfine structure in the extreme ultraviolet: The HF C-X spectrum.

    PubMed

    Philippson, Jeffrey N; Shiell, Ralph C; Reinhold, Elmar; Ubachs, Wim

    2008-11-01

    Clearly resolved hyperfine structure has been observed in the extreme ultraviolet (XUV) spectra of the C (1)Pi, v=0-X (1)Sigma(+), v=0 transition of H(19)F obtained through 1 XUV+1 UV resonance enhanced multiphoton ionization spectroscopy. The hyperfine splitting within the R-branch lines shows significant perturbations, which we attribute to mixing with the rotational levels of the nearby v=29 level of the B (1)Sigma(+) ion-pair state. A deperturbation analysis quantitatively explains the apparent variation of the fluorine magnetic hyperfine parameter a(F), for which a value of 4034(83) MHz was obtained by averaging over the values derived from the R(0)-R(4) lines, after correcting for the effects of the perturbations.

  19. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources

    SciTech Connect

    Cummins, T.; O'Gorman, C.; Dunne, P.; Sokell, E.; O'Sullivan, G.; Hayden, P.

    2014-07-28

    Colliding plasmas produced by neodymium-doped yttrium aluminium garnet (Nd:YAG) laser illumination of tin wedge targets form stagnation layers, the physical parameters of which can be controlled to optimise coupling with a carbon dioxide (CO{sub 2}) heating laser pulse and subsequent extreme ultraviolet (EUV) production. The conversion efficiency (CE) of total laser energy into EUV emission at 13.5 nm ± 1% was 3.6%. Neglecting both the energy required to form the stagnation layer and the EUV light produced before the CO{sub 2} laser pulse is incident results in a CE of 5.1% of the CO{sub 2} laser energy into EUV light.

  20. NRL-ATM extreme ultraviolet solar image TV monitor flown on Skylab

    NASA Technical Reports Server (NTRS)

    Crockett, W. R.; Purcell, J. D.; Schumacher, R. J.; Tousey, R.; Patterson, N. P.

    1977-01-01

    An instrument for recording extreme ultraviolet television images of the sun was flown in the Apollo Telescope Mount on Skylab. Solar radiation in the 171-630 A wavelength range, defined by the transmission band of three thin-film aluminum filters, was focused onto a p-quaterphenyl photon conversion layer by a platinum-coated mirror at normal incidence. The conversion layer was attached to the faceplate of a low light level SEC vidicon. An onboard video monitor enabled the Skylab crews to observe the images in real-time and to identify and follow the development of solar features. Images were also transmitted to the mission control center, where they were used in planning the ATM observing schedule.

  1. Design of an Extreme Ultraviolet Spectrometer Suite for Isochoric-Heated Warm-Dense-Matter Studies

    NASA Astrophysics Data System (ADS)

    Ivancic, S.; Stillman, C. R.; Nilson, P. M.; Froula, D. H.

    2015-11-01

    An ultrafast streaked extreme ultraviolet (XUV) spectrometer (5 to 35 nm) is in development for the measurement of warm dense matter (WDM). In contrast to other forms of pyrometry where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for the measurement of temperature at the material-vacuum interface. The measurement of the surface temperature is of particular importance in constraining models for the release of WDM. The divergence of surface and bulk temperature measurements may indicate gradients in temperature in the target. Coupling the XUV spectrometer to an ultrafast streak camera allows for the observation of picosecond time-scale evolution of the surface layer temperature. Two high-throughput XUV spectrometers are being designed to measure the time-resolved and absolute XUV emission. This material is based upon work supported by the Department of Energy National Nuclear Security Administration under Award Number DE-NA0001944.

  2. Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Chun, Ouyang; Li, Yanqiu; Liu, Lihui

    2013-12-01

    High Numerical Aperture (NA) extreme ultraviolet lithography (EUVL) with different reduction is one option for 16 nm node and below. In our work, as NA increases to about 0.45, we discuss the impacts of reduction ratio of 5 or 6 on resist image performance such as Horizontal-Vertical (H-V) critical dimension (CD) bias for various incident angles and CD Uniformity induced by mask CD errors at wafer level. Commercial software PROLITH ™ and in-house program are adopted in simulation referred above. In conclusion, resist image performance can be improved with the increase of reduction ratio. H-V CD Bias with reduction ratio of 6 is obviously smaller than that with reduction ratio of 5 at maximum incident angle. Additionally, CD Uniformity (nm, 3 sigma) induced by mask CD errors for 5× optics system is larger, which means image quality is worse at 5× optics system.

  3. Design of an extreme ultraviolet spectrometer suite to characterize rapidly heated solid matter

    NASA Astrophysics Data System (ADS)

    Ivancic, S. T.; Stillman, C. R.; Nelson, D.; Begishev, I. A.; Mileham, C.; Nilson, P. M.; Froula, D. H.

    2016-11-01

    An ultrafast streaked extreme-ultraviolet (XUV) spectrometer (5-20 nm) was developed to measure the temperature dynamics in rapidly heated samples. Rapid heating makes it possible to create exotic states of matter that can be probed during their inertial confinement time—tens of picoseconds in the case of micron-sized targets. In contrast to other forms of pyrometry, where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for a temperature measurement at the material-vacuum interface. The surface-temperature measurement constrains models for the release of high-energy-density material. Coupling the XUV spectrometer to an ultrafast (<2-ps) streak camera provided picosecond-time scale evolution of the surface-layer emission. Two high-throughput XUV spectrometers were designed to simultaneously measure the time-resolved and absolute XUV emission.

  4. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

    PubMed

    Kunkemöller, Georg; Mass, Tobias W W; Michel, Ann-Katrin U; Kim, Hyun-Su; Brose, Sascha; Danylyuk, Serhiy; Taubner, Thomas; Juschkin, Larissa

    2015-10-01

    We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.

  5. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOEpatents

    Kublak, G.D.; Richardson, M.C.

    1996-11-19

    Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

  6. Intense extreme ultraviolet emission from the B star Epsilon Canis Majoris

    NASA Technical Reports Server (NTRS)

    Vallerga, John V.; Vedder, Peter W.; Welsh, Barry Y.

    1993-01-01

    We report the discovery of the brightest nonsolar source of EUV emission: the B2 II star Epsilon Canis Majoris. This source has been detected by the Extreme Ultraviolet Explorer satellite's all-sky photometric survey. It is approximately 30 times brighter at 600 A than the predicted emission from the hot white dwarf star HZ 43, previously believed to be the brightest EUV source. We have fitted a simple B star photospheric model to the observed broadband EUV fluxes to explain this emission. Assuming a stellar temperature of 25,000 K and a gravity (log g) of 3.3, we derive an interstellar hydrogen column density of 1.05 +/- 0.05 x 10 exp 18/sq cm over the 187 pc to the star. This corresponds to a line-of-sight number density of hydrogen, of 0.002/cu cm, which is comparable to values found in the rarefied Local Bubble region which surrounds the sun.

  7. The ion microscope as a tool for quantitative measurements in the extreme ultraviolet

    PubMed Central

    Tsatrafyllis, N.; Bergues, B.; Schröder, H.; Veisz, L.; Skantzakis, E.; Gray, D.; Bodi, B.; Kuhn, S.; Tsakiris, G. D.; Charalambidis, D.; Tzallas, P.

    2016-01-01

    We demonstrate a tool for quantitative measurements in the extreme ultraviolet (EUV) spectral region measuring spatially resolved atomic ionization products at the focus of an EUV beam. The ionizing radiation is a comb of the 11th–15th harmonics of a Ti:Sapphire femtosecond laser beam produced in a Xenon gas jet. The spatial ion distribution at the focus of the harmonics is recorded using an ion microscope. Spatially resolved single- and two-photon ionization products of Argon and Helium are observed. From such ion distributions single- and two-photon generalized cross sections can be extracted by a self-calibrating method. The observation of spatially resolved two-EUV-photon ionization constitutes an initial step towards future single-shot temporal characterization of attosecond pulses. PMID:26868370

  8. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  9. Thin absorber extreme ultraviolet photomask based on Ni-TaN nanocomposite material.

    PubMed

    Hay, Darrick; Bagge, Patrick; Khaw, Ian; Sun, Lei; Wood, Obert; Chen, Yulu; Kim, Ryoung-Han; Qi, Zhengqing John; Shi, Zhimin

    2016-08-15

    We study the use of random nanocomposite material as a photomask absorber layer for the next generation of extreme ultraviolet (EUV) lithography. By introducing nickel nanoparticles (NPs) randomly into a TaN host, the nanocomposite absorber layer can greatly reduce the reflectivity as compared with the standard TaN layer of the same thickness. Finite integral simulations show that the reduction in the reflectivity is mainly due to the enhanced absorption by the Ni NPs. The fluctuation in reflectivity induced by scattering and random position of the NPs is found to be on the order of 0.1%. Based on these observations, we build an effective medium model for the nanocomposite absorber layer and use the transfer matrix method to identify optimal absorber designs that utilize cavity effects to reduce the required volume fraction of Ni NPs. We further perform a process simulation and show that our approach can greatly reduce the HV bias in the lithography process. PMID:27519090

  10. Single spherical mirror optic for extreme ultraviolet lithography enabled by inverse lithography technology.

    PubMed

    Scranton, Gregg; Bhargava, Samarth; Ganapati, Vidya; Yablonovitch, Eli

    2014-10-20

    Traditionally, aberration correction in extreme ultraviolet (EUV) projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. We analyze a single spherical mirror projection optical system where aberration correction is built into the mask itself, through Inverse Lithography Technology (ILT). By having fewer mirrors, this would reduce the power requirements for EUV lithography. We model a single spherical mirror system with orders of magnitude more spherical aberration than would ever be tolerated in a traditional multiple mirror system. By using ILT, (implemented by an adjoint-based gradient descent optimization algorithm), we design photomasks that successfully print test patterns, in spite of these enormous aberrations. This mathematical method was tested with a 6 plane wave illumination source. Nonetheless, it would have poor power throughput from a totally incoherent source. PMID:25401536

  11. The ion microscope as a tool for quantitative measurements in the extreme ultraviolet.

    PubMed

    Tsatrafyllis, N; Bergues, B; Schröder, H; Veisz, L; Skantzakis, E; Gray, D; Bodi, B; Kuhn, S; Tsakiris, G D; Charalambidis, D; Tzallas, P

    2016-01-01

    We demonstrate a tool for quantitative measurements in the extreme ultraviolet (EUV) spectral region measuring spatially resolved atomic ionization products at the focus of an EUV beam. The ionizing radiation is a comb of the 11(th)-15(th) harmonics of a Ti:Sapphire femtosecond laser beam produced in a Xenon gas jet. The spatial ion distribution at the focus of the harmonics is recorded using an ion microscope. Spatially resolved single- and two-photon ionization products of Argon and Helium are observed. From such ion distributions single- and two-photon generalized cross sections can be extracted by a self-calibrating method. The observation of spatially resolved two-EUV-photon ionization constitutes an initial step towards future single-shot temporal characterization of attosecond pulses. PMID:26868370

  12. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

    PubMed

    Kunkemöller, Georg; Mass, Tobias W W; Michel, Ann-Katrin U; Kim, Hyun-Su; Brose, Sascha; Danylyuk, Serhiy; Taubner, Thomas; Juschkin, Larissa

    2015-10-01

    We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement. PMID:26480066

  13. Note: Thermally stable thin-film filters for high-power extreme-ultraviolet applications.

    PubMed

    Tarrio, C; Berg, R F; Lucatorto, T B; Lairson, B; Lopez, H; Ayers, T

    2015-11-01

    We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm(-2), Ni-mesh-backed Zr filters have a typical lifetime of 20 h, at which point they suffer from pinholes and a 50% loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters to be about 634 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 60 K. We have exposed a Si filter backed by such a mesh for more than 60 h with little loss of transmission and no leaks. PMID:26628184

  14. Spectral purification and infrared light recycling in extreme ultraviolet lithography sources.

    PubMed

    Bayraktar, Muharrem; van Goor, Fred A; Boller, Klaus J; Bijkerk, Fred

    2014-04-01

    We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff's diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma. PMID:24718234

  15. Laboratory calibration of density-dependent lines in the extreme ultraviolet spectral region

    SciTech Connect

    Lepson, J. K.; Beiersdorfer, P.; Gu, M. F.; Desai, P.; Bitter, M.; Roquemore, L.; Reinke, M. L.

    2012-05-25

    We have been making spectral measurements in the extreme ultraviolet (EUV) from different laboratory sources in order to investigate the electron density dependence of various astrophysically important emission lines and to test the atomic models underlying the diagnostic line ratios. The measurement are being performed at the Livermore EBIT-I electron beam ion trap, the National Spherical Torus Experiment (NSTX) at Princeton, and the Alcator C-Mod tokamak at the Massachusetts Institute of Technology, which together span an electron density of four orders of magnitude and which allow us to test the various models at high and low density limits. Here we present measurements of Fe XXII and Ar XIV, which include new data from an ultra high resolution ({lambda}/{Delta}{lambda} >4000) spectrometer at the EBIT-I facility. We found good agreement between the measurements and modeling calculations for Fe XXII, but poorer agreement for Ar XIV.

  16. Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

    NASA Astrophysics Data System (ADS)

    Kuznetsov, Ilya; Filevich, Jorge; Dong, Feng; Woolston, Mark; Chao, Weilun; Anderson, Erik H.; Bernstein, Elliot R.; Crick, Dean C.; Rocca, Jorge J.; Menoni, Carmen S.

    2015-04-01

    Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials research, biology and medicine. Mass spectral imaging makes it possible to visualize the spatial organization of multiple molecular components at a sample's surface. However, it is challenging for mass spectral imaging to map molecular composition in three dimensions (3D) with submicron resolution. Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Molecular imaging with a lateral resolution of 75 nm and a depth resolution of 20 nm is demonstrated. These results open opportunities to visualize chemical composition and chemical changes in 3D at the nanoscale.

  17. Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

    PubMed Central

    Kuznetsov, Ilya; Filevich, Jorge; Dong, Feng; Woolston, Mark; Chao, Weilun; Anderson, Erik H.; Bernstein, Elliot R.; Crick, Dean C.; Rocca, Jorge J.; Menoni, Carmen S.

    2015-01-01

    Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials research, biology and medicine. Mass spectral imaging makes it possible to visualize the spatial organization of multiple molecular components at a sample's surface. However, it is challenging for mass spectral imaging to map molecular composition in three dimensions (3D) with submicron resolution. Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Molecular imaging with a lateral resolution of 75 nm and a depth resolution of 20 nm is demonstrated. These results open opportunities to visualize chemical composition and chemical changes in 3D at the nanoscale. PMID:25903827

  18. Invisible marking system by extreme ultraviolet radiation: the new frontier for anti-counterfeiting tags

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2016-07-01

    We present a marking technology which uses extreme ultraviolet radiation to write invisible patterns on tags based on alkali fluoride thin films. The shape of the pattern is pre-determined by a mask (in the case of contact lithography) or by a suitable mirror (projection lithography). Tags marked using this method offer a much better protection against fakes than currently available anti-counterfeiting techniques. The complexity and cost of this technology can be tailored to the value of the good to be protected, leaving, on the other hand, the specific reading technique straightforward. So far, we have exploited our invisible marking to tag artworks, identity cards, electrical components, and containers of radioactive wastes. Advantages and limits of this technology are discussed in comparison with the anti-counterfeiting systems available in the market.

  19. Extreme ultraviolet lithography for 0.1{micro}m devices

    SciTech Connect

    Vaidya, S; Sweeney, D W; Stullen, R; Attwood, D

    1999-04-27

    Extreme Ultraviolet Lithography (EUVL) has emerged as one of the leading successors to optics for 0.1{micro}m IC fabrication. Its strongest attribute is the potential to scale to much finer resolution at high throughput. As such, this technique could meet the lithography needs for Si ULSI down to fundamental device limits. In the US, Lawrence Livermore, Sandia and Lawrence Berkeley Laboratories are participating in an industry funded research effort to evolve EUV technology and build a prototype camera for lithographic exposure. More recently, both Europe and Japan have initiated government/industry sponsored programs in EUVL development. This talk focuses on the program successes to date, and highlights some of the challenges that still lie ahead.

  20. Extreme Ultraviolet Lithography for 0.1 {micro}m Devices

    SciTech Connect

    Vaidya, S.; Sweeney, D.W.; Stulen, R.; Attwood, D.

    1999-07-07

    Extreme Ultraviolet Lithography (EUVL) has emerged as one of the leading successors to optics for 0.1 {micro}m IC fabrication. Its strongest attribute is the potential to scale to much finer resolution at high throughput. As such, this technique could meet the lithography needs for Si ULSI down to fundamental device limits. In the US, Lawrence Livermore, Sandia, and Lawrence Berkeley National Laboratories are participating in an industry funded research effort to evolve EUV technology and build a prototype camera for lithographic exposure. More recently, both Europe and Japan have initiated government/industry sponsored programs in EUVL development. This talk will focus on our program successes to date, and highlight some of the challenges that still lie ahead.

  1. Carbon contamination of extreme ultraviolet (EUV) mask and its effect on imaging

    SciTech Connect

    Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Garg, Rashi; Thomas, Petros; Mbanaso, Chimaobi; Wuest, Andreas; Goodwin, Frank; Huh, Sungmin; Naulleau, Patrick; Goldlberg, Kenneth; Mochi, Iacopo; Denbeaux, Gregory

    2009-02-02

    Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

  2. Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle

    NASA Astrophysics Data System (ADS)

    Ko, Ki-Ho; Mo, Soo-Yeon; Kim, In-Seon; Oh, Hye-Keun

    2016-04-01

    The absorption of extreme ultraviolet (EUV) light by the mask-protecting pellicle could be the most critical problem preventing widespread EUV adoption because EUV source power is still too limited to facilitate its use in mass production. We found that transmission loss due to the EUV pellicle could be compensated through the use of proper optical proximity correction (OPC) applied to the mask-pellicle system. Patterning results of optical proximity correction corrected masks with different transmission pellicles are shown for various one-dimensional and two-dimensional patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss, even when using a pellicle with 80% one-pass transmission. The OPC process described in this paper can speed EUV adoption by allowing the use of much thicker films with higher absorption.

  3. The expansion velocities of laser-produced plasmas determined from extreme ultraviolet spectral line profiles

    NASA Technical Reports Server (NTRS)

    Feldman, U.; Doschek, G. A.; Behring, W. E.; Cohen, L.

    1977-01-01

    The expansion of laser-produced plasma is determined from the shapes of spectral lines of highly ionized iron emitted in the extreme ultraviolet. The plasmas were produced by focusing the pulse from a Nd:glass laser onto solid planar targets, and spectra were recorded with a high-resolution grazing-incidence spectrograph. From the Doppler broadening of lines of Fe XX and Fe XXI, expansion velocities of about 830 km/s were determined. The relative time-averaged ion abundances of Fe XVIII, Fe XIX, Fe XX, and Fe XXI are estimated for three different spectra. The abundances do not differ by more than a factor of 4 for any of the spectra.

  4. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    DOE PAGES

    Li, Zheng; Vendrell, Oriol

    2016-01-13

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. As a result, for situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20more » to 40 fs driven by strong non-adiabatic effects.« less

  5. Study of an astronomical extreme ultraviolet rocket spectrometer for use on shuttle missions

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1977-01-01

    The adaptation of an extreme ultraviolet astronomy rocket payload for flight on the shuttle was studied. A sample payload for determining integration and flight procedures for experiments which may typically be flown on shuttle missions was provided. The electrical, mechanical, thermal, and operational interface requirements between the payload and the orbiter were examined. Of particular concern was establishing a baseline payload accommodation which utilizes proven common hardware for electrical, data, command, and possibly real time monitoring functions. The instrument integration and checkout procedures necessary to assure satisfactory in-orbit instrument performance were defined and those procedures which can be implemented in such a way as to minimize their impact on orbiter integration schedules were identified.

  6. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    PubMed Central

    Li, Zheng; Vendrell, Oriol

    2016-01-01

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. For situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects. PMID:26798842

  7. Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks

    NASA Astrophysics Data System (ADS)

    Isogawa, Takeshi; Seki, Kazunori; Lawliss, Mark; Qi, Zhengqing John; Rankin, Jed; Akima, Shinji

    2016-04-01

    A variety of repairs were conducted on extreme ultraviolet (EUV) multilayer, including protection against pattern degradation in manufactural use, in order to evaluate feasibility of multilayer repair and subsequent protection schemes. The efficacy of postrepair protection techniques is evaluated to determine the lifetime of multilayer repairs. Simulations were used to select the optimal material thicknesses for repair protection, and the simulation results are verified with the lithographic results. The results showed a high correlation coefficient. Finally, all repaired sites were cleaned multiple times to quantify repair durability and impact on wafer critical dimension (CD). Aerial imaging of the repair sites before and after cleans showed a dramatic degradation of wafer CD. However, we show that applying a surface protection material after multilayer repair successfully mitigates the influence of multilayer degradation during extensive manufacturing operations.

  8. Ionization Avalanching in Clusters Ignited by Extreme-Ultraviolet Driven Seed Electrons.

    PubMed

    Schütte, Bernd; Arbeiter, Mathias; Mermillod-Blondin, Alexandre; Vrakking, Marc J J; Rouzée, Arnaud; Fennel, Thomas

    2016-01-22

    We study the ionization dynamics of Ar clusters exposed to ultrashort near-infrared (NIR) laser pulses for intensities well below the threshold at which tunnel ionization ignites nanoplasma formation. We find that the emission of highly charged ions up to Ar^{8+} can be switched on with unit contrast by generating only a few seed electrons with an ultrashort extreme-ultraviolet (XUV) pulse prior to the NIR field. Molecular dynamics simulations can explain the experimental observations and predict a generic scenario where efficient heating via inverse bremsstrahlung and NIR avalanching is followed by resonant collective nanoplasma heating. The temporally and spatially well-controlled injection of the XUV seed electrons opens new routes for controlling avalanching and heating phenomena in nanostructures and solids, with implications for both fundamental and applied laser-matter science.

  9. The diffuse extreme-ultraviolet background - Constraints on hot coronal plasma

    NASA Technical Reports Server (NTRS)

    Paresce, F.; Stern, R.

    1981-01-01

    The Apollo-Soyuz data and data reported by Cash et al. (1976) have been reanalyzed in terms of both isothermal models and temperature distribution models. In the latter case, a power-law form is assumed for the relation between emission measure and temperature. A new upper limit on diffuse flux in the 20-73 eV band derived from Apollo-Soyuz observations made in the earth's shadow has been incorporated in the calculation. In the considered investigation the results of the new analysis are presented and the implications for the physical properties of the hot component of the interstellar medium are discussed. The analysis of the Berkeley extreme ultraviolet (EUV) diffuse background measurements using either isothermal or power law temperature distribution models for the emitting plasma indicates excellent qualitative agreement with hard X-ray data that suggest the sun to be immersed in a hot plasma that pervades most of space out to approximately 100 pc.

  10. NRL-ATM extreme ultraviolet solar image TV monitor flown on Skylab.

    PubMed

    Crockett, W R; Patterson, N P; Purcell, J D; Schumacher, R J; Tousey, R

    1977-04-01

    An instrument for recording extreme ultraviolet television images of the sun was flown in the Apollo Telescope Mount on Skylab. Solar radiation in the 171-630 A wavelength range, defined by the transmission band of three thin-film aluminum filters, was focused onto a p-quaterphenyl photon conversion layer by a platinum-coated mirror at normal incidence. The conversion layer was attached to the faceplate of a low light level SEC vidicon. An onboard video monitor enabled the Skylab crews to observe the images in realtime and to identify and follow the development of solar features. Images were also transmitted to the mission control center, where they were used in planning the ATM observing schedule.

  11. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    NASA Astrophysics Data System (ADS)

    Ahad, Inam Ul; Butruk, Beata; Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Ciach, Tomasz; Brabazon, Dermot

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser-plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  12. Ionization Avalanching in Clusters Ignited by Extreme-Ultraviolet Driven Seed Electrons.

    PubMed

    Schütte, Bernd; Arbeiter, Mathias; Mermillod-Blondin, Alexandre; Vrakking, Marc J J; Rouzée, Arnaud; Fennel, Thomas

    2016-01-22

    We study the ionization dynamics of Ar clusters exposed to ultrashort near-infrared (NIR) laser pulses for intensities well below the threshold at which tunnel ionization ignites nanoplasma formation. We find that the emission of highly charged ions up to Ar^{8+} can be switched on with unit contrast by generating only a few seed electrons with an ultrashort extreme-ultraviolet (XUV) pulse prior to the NIR field. Molecular dynamics simulations can explain the experimental observations and predict a generic scenario where efficient heating via inverse bremsstrahlung and NIR avalanching is followed by resonant collective nanoplasma heating. The temporally and spatially well-controlled injection of the XUV seed electrons opens new routes for controlling avalanching and heating phenomena in nanostructures and solids, with implications for both fundamental and applied laser-matter science. PMID:26849590

  13. Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography

    DOEpatents

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2004-11-23

    A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

  14. Ultrafast Extreme Ultraviolet Spectroscopy of Lead Iodide and Methylammonium Lead Iodide

    NASA Astrophysics Data System (ADS)

    Verkamp, Max; Lin, Ming-Fu; Ryland, Elizabeth; Vura-Weis, Josh

    Methylammonium lead iodide (perovskite) is a leading candidate for use in next-generation solar cell devices. However, the photophysics of perovskite responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) spectroscopy was used to investigate relaxation dynamics in perovskite and its precursor, lead iodide, with carrier-specific signals arising from transitions from a common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation in a broad spectrum (40-70 eV) were obtained using high-harmonic generation in a tabletop instrument. Transient absorption measurements with visible pump (3.1 eV) and XUV probe directly observed the relaxation of charge carriers after above band excitation for both perovskite and lead iodide in the femtosecond and picosecond time ranges.

  15. Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

    SciTech Connect

    Hara, Hiroyuki Arai, Goki; Dinh, Thanh-Hung; Higashiguchi, Takeshi; Jiang, Weihua; Miura, Taisuke; Endo, Akira; Ejima, Takeo; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Sunahara, Atsushi

    2015-11-21

    The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18–20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

  16. Extreme Ultra-Violet Spectroscopy of the Lower Solar Atmosphere During Solar Flares (Invited Review)

    NASA Astrophysics Data System (ADS)

    Milligan, Ryan O.

    2015-12-01

    The extreme ultra-violet (EUV) portion of the solar spectrum contains a wealth of diagnostic tools for probing the lower solar atmosphere in response to an injection of energy, particularly during the impulsive phase of solar flares. These include temperature- and density-sensitive line ratios, Doppler-shifted emission lines, nonthermal broadening, abundance measurements, differential emission measure profiles, continuum temperatures and energetics, among others. In this article I review some of the recent advances that have been made using these techniques to infer physical properties of heated plasma at footpoint and ribbon locations during the initial stages of solar flares. I primarily focus on studies that have utilised spectroscopic EUV data from Hinode/EUV Imaging Spectrometer (EIS) and Solar Dynamics Observatory/EUV Variability Experiment (SDO/EVE), and I also provide some historical background and a summary of future spectroscopic instrumentation.

  17. Methods and apparatus for use with extreme ultraviolet light having contamination protection

    DOEpatents

    Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy; Klebanoff, Leonard E.; Delgado, Gildardo R.; Rader, Daniel J.; Geller, Anthony S.; Gallis, Michail A.

    2016-07-12

    An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

  18. Complementary ion and extreme ultra-violet spectrometer for laser-plasma diagnosis

    SciTech Connect

    Ter-Avetisyan, S.; Ramakrishna, B.; Doria, D.; Sarri, G.; Zepf, M.; Borghesi, M.; Ehrentraut, L.; Stiel, H.; Steinke, S.; Schnuerer, M.; Nickles, P. V.; Sandner, W.; Priebe, G.

    2009-10-15

    Simultaneous detection of extreme ultra-violet (XUV) and ion emission along the same line of sight provides comprehensive insight into the evolution of plasmas. This type of combined spectroscopy is applied to diagnose laser interaction with a spray target. The use of a micro-channel-plate detector assures reliable detection of both XUV and ion signals in a single laser shot. The qualitative analysis of the ion emission and XUV spectra allows to gain detailed information about the plasma conditions, and a correlation between the energetic proton emission and the XUV plasma emission can be suggested. The measured XUV emission spectrum from water spray shows efficient deceleration of laser accelerated electrons with energies up to keV in the initially cold background plasma and the collisional heating of the plasma.

  19. Electron-Impact-Induced Emission Cross Sections of Neon in the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Kanik, I.; Ajello, J. M.; James, G. K.

    1996-01-01

    We have measured the extreme ultraviolet (EUV) spectrum of neon produced by electron excitation. The measurements were obtained under optically thin conditions, and at a spectral resolution of 0.5 nm full width at half maximum (FWHM). The most prominent features of the EUV spectrum between 45-80 nm are the resonance lines of Ne I at 73.6 and 74.4 nm and a multiplet of Ne II at 46.14 nm (the average value for the line center of the two closely spaced ion lines at 46.07 and 46.22 nm). Absolute emission cross sections of these lines at 300 eV were measured and compared to other previous measurements.

  20. Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

    SciTech Connect

    Naulleau, Patrick; Anderson, Christopher N.; Chiu, Jerrin; Dean, Kim; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Hoef, Brian; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; Ma, Andy; Montgomery, Warren; Niakoula, Dimitra; Park, Joo-On; Wallow, Tom; Wurm, Stefan

    2008-09-02

    Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the 0.3 numerical aperture SEMATECH Berkeley MET operating as a resist and mask test center. Here they present an update on the tool summarizing some of the latest test and characterization results. they provide an update on the long-term aberration stability of the tool and present line-space imaging in chemically amplified photoresist down to the 20-nm half-pitch level. Although resist development has shown substantial progress in the area of resolution, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of mask contributors to the LER observed from the SEMATECH Berkeley microfield tool.

  1. Fluorescence efficiency and visible re-emission spectrum of tetraphenyl butadiene films at extreme ultraviolet wavelengths

    NASA Astrophysics Data System (ADS)

    Gehman, V. M.; Seibert, S. R.; Rielage, K.; Hime, A.; Sun, Y.; Mei, D.-M.; Maassen, J.; Moore, D.

    2011-10-01

    A large number of current and future experiments in neutrino and dark matter detection use the scintillation light from noble elements as a mechanism for measuring energy deposition. The scintillation light from these elements is produced in the extreme ultraviolet (EUV) range, from 60 to 200 nm. Currently, the most practical technique for observing light at these wavelengths is to surround the scintillation volume with a thin film of tetraphenyl butadiene (TPB) to act as a fluor. The TPB film absorbs EUV photons and re-emits visible photons, detectable with a variety of commercial photosensors. Here we present a measurement of the re-emission spectrum of TPB films when illuminated with 128, 160, 175, and 250 nm light. We also measure the fluorescence efficiency as a function of incident wavelength from 120 to 250 nm.

  2. Minimization of the shadow patterns produced by periodic mesh grids in extreme ultraviolet telescopes.

    PubMed

    Auchère, Frédéric; Rizzi, Julien; Philippon, Anne; Rochus, Pierre

    2011-01-01

    Thin metallic films are used as passband filters in space telescopes operating in the extreme ultraviolet (EUV). Because of their thinness, typically 100 to 200 nm, they are very sensitive to static pressure differentials and to mechanic and acoustic vibrations. Therefore, they are difficult to manage in all phases of a space program, from manufacturing to vacuum testing to launch. A common solution to this problem is to reinforce them with fine mesh grids with pitches ranging from a few hundred micrometers to a few millimeters. Depending on their location in the optical path, the main effect of these periodic grids is either to diffract light or to cast penumbral shadows on the focal plane. In this paper, we analyze the formation of the shadow modulation patterns and derive design rules to minimize their amplitude. The minimization principle is illustrated by an application to a solar EUV telescope.

  3. FIRST OBSERVATIONS OF A DOME-SHAPED LARGE-SCALE CORONAL EXTREME-ULTRAVIOLET WAVE

    SciTech Connect

    Veronig, A. M.; Muhr, N.; Kienreich, I. W.; Temmer, M.; Vrsnak, B.

    2010-06-10

    We present first observations of a dome-shaped large-scale extreme-ultraviolet coronal wave, recorded by the Extreme Ultraviolet Imager instrument on board STEREO-B on 2010 January 17. The main arguments that the observed structure is the wave dome (and not the coronal mass ejection, CME) are (1) the spherical form and sharpness of the dome's outer edge and the erupting CME loops observed inside the dome; (2) the low-coronal wave signatures above the limb perfectly connecting to the on-disk signatures of the wave; (3) the lateral extent of the expanding dome which is much larger than that of the coronal dimming; and (4) the associated high-frequency type II burst indicating shock formation low in the corona. The velocity of the upward expansion of the wave dome (v {approx} 650 km s{sup -1}) is larger than that of the lateral expansion of the wave (v {approx} 280 km s{sup -1}), indicating that the upward dome expansion is driven all the time, and thus depends on the CME speed, whereas in the lateral direction it is freely propagating after the CME lateral expansion stops. We also examine the evolution of the perturbation characteristics: first the perturbation profile steepens and the amplitude increases. Thereafter, the amplitude decreases with r {sup -2.5{+-}0.3}, the width broadens, and the integral below the perturbation remains constant. Our findings are consistent with the spherical expansion and decay of a weakly shocked fast-mode MHD wave.

  4. Concept Study Report: Extreme-Ultraviolet Imaging Spectrometer Solar-B

    NASA Technical Reports Server (NTRS)

    Doschek, George, A.; Brown, Charles M.; Davila, Joseph M.; Dere, Kenneth P.; Korendyke, Clarence M.; Mariska, John T.; Seely, John F.

    1999-01-01

    We propose a next generation Extreme-ultraviolet Imaging Spectrometer (EIS) that for the first time combines high spectral, spatial, and temporal resolution in a single solar spectroscopic instrument. The instrument consists of a multilayer-coated off-axis telescope mirror and a multilayer-coated grating spectrometer. The telescope mirror forms solar images on the spectrometer entrance slit assembly. The spectrometer forms stigmatic spectra of the solar region located at the slit. This region is selected by the articulated telescope mirror. Monochromatic images are obtained either by rastering the solar region across a narrow entrance slit, or by using a very wide slit (called a slot) in place of the slit. Monochromatic images of the region centered on the slot are obtained in a single exposure. Half of each optic is coated to maximize reflectance at 195 Angstroms; the other half to maximize reflectance at 270 Angstroms. The two Extreme Ultraviolet (EUV) wavelength bands have been selected to maximize spectral and dynamical and plasma diagnostic capabilities. Spectral lines are observed that are formed over a temperature range from about 0.1 MK to about 20 MK. The main EIS instrument characteristics are: wavelength bands - 180 to 204 Angstroms; 250 to 290 Angstroms; spectral resolution - 0.0223 Angstroms/pixel (34.3km/s at 195 Angstroms and 23.6 km/s at 284 Angstroms); slit dimensions - 4 slits, two currently specified dimensions are 1" x 1024" and 50" x 1024" (the slot); largest spatial field of view in a single exposure - 50" x 1024"; highest time resolution for active region velocity studies - 4.4 s.

  5. Extreme ultraviolet spectroscopy and photometry of VV Puppis during a high accretion state

    NASA Technical Reports Server (NTRS)

    Vennes, Stephane; Szkody, Paula; Sion, Edward M.; Long, Knox S.

    1995-01-01

    We determine the physical properties of the accretion region of the AM Her-type binary VV Puppis using extreme ultraviolet (EUV) medium-resolution spectroscopy and photometry obtained with the Extreme Ultraviolet Explorer (EUVE) observatory. The EUV continuum from VV Pup was detected in the wavelength range from 75 to 135 A and was simultaneously recorded with the Deep Survey/Spectrometer (DS/S) imaging telescope, allowing for the extraction of an accurate light curve. VV Pup appeared to have entered a high-accretion state just prior to the pointed EUVE observations. We use the EUV light curve to infer the diameter of the accretion region (d = 220 km) assuming a hemispherical geometry and a radius of 9000 km for the white dwarf. We perform a model atmosphere analysis and, based on the light curve properties and assuming a distance of 145 pc, we derive an effective temperature of the accretion region in the range 270,000 is less than T(sub eff) is less than 360,000 K and a neutral hydrogen column density in the local interstellar medium of n(sub H) = 1.9 - 3.7 x 10(exp 19)/sq cm. The total EUV/soft X-ray energy radiated by the accretion region is approximately 3.5 x 10(exp 32) ergs/s. Our results provide a first verification of past suggestions that deep heating of the white dwarf surface produces the soft X-ray flux from the polars. We present a possible detection of O VI absortion features, and we suggest that extensive EUVE observations targeting high-accretion events may result in oxygen and heavier element abundance determination in the accretion region.

  6. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Technical Reports Server (NTRS)

    Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-01-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  7. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

    NASA Astrophysics Data System (ADS)

    Wang, L.; Kirk, E.; Wäckerlin, C.; Schneider, C. W.; Hojeij, M.; Gobrecht, J.; Ekinci, Y.

    2014-06-01

    We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography.

  8. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography.

    PubMed

    Wang, L; Kirk, E; Wäckerlin, C; Schneider, C W; Hojeij, M; Gobrecht, J; Ekinci, Y

    2014-06-13

    We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography. PMID:24850475

  9. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet.

    PubMed

    Géneaux, R; Camper, A; Auguste, T; Gobert, O; Caillat, J; Taïeb, R; Ruchon, T

    2016-01-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices. PMID:27573787

  10. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet

    PubMed Central

    Géneaux, R.; Camper, A.; Auguste, T.; Gobert, O.; Caillat, J.; Taïeb, R.; Ruchon, T.

    2016-01-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices. PMID:27573787

  11. An extreme ultraviolet Michelson interferometer for experiments at free-electron lasers

    SciTech Connect

    Hilbert, Vinzenz; Fuchs, Silvio; Paulus, Gerhard G.; Zastrau, Ulf; Blinne, Alexander; Feigl, Torsten; Kämpfer, Tino; Rödel, Christian; Uschmann, Ingo; Wünsche, Martin; Förster, Eckhart

    2013-09-15

    We present a Michelson interferometer for 13.5 nm soft x-ray radiation. It is characterized in a proof-of-principle experiment using synchrotron radiation, where the temporal coherence is measured to be 13 fs. The curvature of the thin-film beam splitter membrane is derived from the observed fringe pattern. The applicability of this Michelson interferometer at intense free-electron lasers is investigated, particularly with respect to radiation damage. This study highlights the potential role of such Michelson interferometers in solid density plasma investigations using, for instance, extreme soft x-ray free-electron lasers. A setup using the Michelson interferometer for pseudo-Nomarski-interferometry is proposed.

  12. Transmission filter for the extreme ultraviolet spectral region composed of a thin Saran (C2H2Cl2) foil

    NASA Astrophysics Data System (ADS)

    Seely, John F.; Shirey, L.; Kingman, A.

    1989-05-01

    Saran foils of 4000-A thickness have been fabricated and used as transmission filters in the extreme ultraviolet spectral region. The transmittances of the Saran foils were determined for the 20-620-A wavelength region. The foils transmitted radiation with wavelengths between the L absorption edge of chlorine at 61.4 and about 120 A.

  13. The Limb-Imaging Ionospheric and Thermospheric Extreme-Ultraviolet Spectrograph (LITES) on the ISS

    NASA Astrophysics Data System (ADS)

    Stephan, Andrew W.; Finn, Susanna C.; Cook, Timothy A.; Chakrabarti, Supriya; Budzien, Scott A.

    2015-04-01

    The Limb-imaging Ionospheric and Thermospheric Extreme-ultraviolet Spectrograph (LITES) is being prepared for flight in early 2016 aboard the Space Test Program Houston 5 (STP-H5) experiment pallet to the International Space Station (ISS). LITES is an imaging spectrograph that spans 60-140 nm and will obtain limb profiles of the ionosphere, along with the key upper atmospheric constituents O and N2. During the day, LITES measures the OII 83.4 and 61.7 nm emissions that are produced by solar photoionization of atomic oxygen in the lower thermosphere. The 83.4 nm emission is resonantly scattered by ionospheric O+, and thus its altitude profile is formed by both the initial ionization brightness and the ionospheric content. The 61.7 nm emission is not scattered and is used to constrain the photoionization brightness in the retrieval. At night, recombination of O+ and electrons produces optically thin emissions at 91.1 and 135.6 nm that are used to tomographically reconstruct the two-dimensional ionosphere in the orbital plane.These observations will be complemented and validated by ground-based data from an international network of digisondes, visible spectrographs, and imagers, which will provide ground truth for the space-based measurements. Additionally, the STP-H5 mission includes the GPS Radio Occultation and Ultraviolet Photometer Co-located (GROUP-C) experiment that consists of a high-sensitivity, nadir-viewing photometer that measures the nighttime ionospheric airglow at 135.6 nm, and a GPS receiver that measures ionospheric electron content and scintillation. We will discuss the LITES measurements and science goals, and how LITES data will be combined with these other experiments to study low and middle latitude ionospheric structures on a global scale.

  14. The High-resolution Extreme-ultraviolet Spectrum of N2 by Electron Impact

    NASA Astrophysics Data System (ADS)

    Heays, A. N.; Ajello, J. M.; Aguilar, A.; Lewis, B. R.; Gibson, S. T.

    2014-04-01

    We have analyzed high-resolution (FWHM = 0.2 Å) extreme-ultraviolet (EUV, 800-1350 Å) laboratory emission spectra of molecular nitrogen excited by an electron impact at 20 and 100 eV under (mostly) optically thin, single-scattering experimental conditions. A total of 491 emission features were observed from N2 electronic-vibrational transitions and atomic N I and N II multiplets and their emission cross sections were measured. Molecular emission was observed at vibrationally excited ground-state levels as high as v'' = 17, from the a 1Π g , b 1Π u , and b'1Σ u + excited valence states and the Rydberg series c'n +1 1Σ u +, cn 1Π u , and on 1Π u for n between 3 and 9. The frequently blended molecular emission bands were disentangled with the aid of a sophisticated and predictive quantum-mechanical model of excited states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. Improved model parameters describing electronic transition moments were obtained from the experiment and allowed for a reliable prediction of the vibrationally summed electronic emission cross section, including an extrapolation to unobserved emission bands and those that are optically thick in the experimental spectra. Vibrationally dependent electronic excitation functions were inferred from a comparison of emission features following 20 and 100 eV electron-impact collisional excitation. The electron-impact-induced fluorescence measurements are compared with Cassini Ultraviolet Imaging Spectrograph observations of emissions from Titan's upper atmosphere.

  15. First spectral observations of the diffuse background with the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Jelinksy, P.; Vallerga, J. V.; Edelstein, J.

    1995-01-01

    We present the first results from the analysis of the spectroscopic observations of diffuse extreme ultraviolet (EUV) emission taken with the Extreme Ultraviolet Explorer (EUVE) spectrometers in the wavelength range 160-740 A. Although not designed or optimized for diffuse observation, the EUVE spectrometers are the most sensitive diffuse EUV spectrometer in orbit. The spectral resolution for diffuse emission of the medium and long-wavelength spectrometers are 17 and 34 A FWHM, respectively. During the period from 1992 July 25 to 1992 August 19, the spectrometers surveyed a 2 x 20 deg field scanned from (l, b) = (24 deg, -28 deg) to (44 deg, -74 deg) with a total effective exposure time of 575,232 s. The only emission lines detected were those of He I and He II (584, 537, 304 A) with intensities consistent with local geocoronal and/or interplanetary scattering of solar radiation (584 A = 1.30 rayleighs; 537 A = 0.040 R; and 304 A = 0.029 R). Models of the soft X-ray background, which results from a 10(exp 6) K plasma (Local Bubble) surrounding the neutral gas near the Sun (Local Cloud), predict that most of the flux from the hot plasma appears as emission lines in the EUV. We have compared these spectral predictions with our observations to place limits on the emission measure versus temperature of the proposed hot plasma. Using the same plasma model, we derived emissions measures for our data and the C and B soft X-ray bands of the Wisconsin rocket survey. We find that our limits for the plasma emission measure are a factor of 5-10 below the C- and B-band emission measures over the temperature range from 10(exp 5.7) to 10(exp 6.4) K. We explore possible scenarios that could reconcile our results with the X-ray surveys and conclude that depletion or a nonequilibrium plasma state rather than absorption are the more likely explanations of the discrepancy. We also show that our spectrum is inconsistent with the spectrum from the approximately 10(exp 5) K gas at the

  16. Matter in Extreme Conditions (MEC) Instrument at the Linac Coherent Light Source

    NASA Astrophysics Data System (ADS)

    Lee, Hae

    2013-06-01

    The behavior and physical properties of matter under extreme conditions are of fundamental scientific interest. Extreme conditions created by intense light source generates dense state with densities of up to several times of solid density, temperatures of 0.1 eV to 100s eV, and pressures of 10s kbar to 10s Mbar. Model calculations in this regime predict electronic and structural phase transitions with new atomic and electronic band structure, anomalous transport, and changes of scattering properties and opacity. A new technique using the Linac Coherent Light Source (LCLS), an x-ray free electron laser source, was developed at Matter in Extreme Conditions (MEC) endstation to study wide range of extreme conditions in phase space. The LCLS has >=3 mJ per 60 fs pulse enabling an intensity x-ray beam between 4 keV -9.5 keV to be focused onto a small spot ~1 micron at MEC. The research areas that MEC instrument will address include equation of state, behavior of materials under high-pressure, and phenomena of solid materials under extreme conditions. We operate MEC instrument for users' experiments studying warm dense matter, hot dense matter, and high pressure physics. Here, we present the details of the MEC instrument, capabilities and progress. The MEC Instrument is funded by fusion energy science of the U.S. Department of Energy. The author would like to thank the LCLS MECi project team.

  17. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    SciTech Connect

    Malinowski, Pawel E.; Mertens, Robert; Van Hoof, Chris; Duboz, Jean-Yves; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Giordanengo, Boris; BenMoussa, Ali

    2011-04-04

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  18. Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

    NASA Astrophysics Data System (ADS)

    Del Re, Ryan; Passarelli, James; Sortland, Miriam; Cardineau, Brian; Ekinci, Yasin; Buitrago, Elizabeth; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R2Sn) were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of )SnCC)2 (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of )Sn) (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600 mJ/cm2). Two photoresists that use olefin-based carboxylates, )SnCCH (3) and )SnCC (4), demonstrated better photospeeds (5 mJ/cm2 and 27 mJ/cm2) but worse LER.

  19. TEMPERATURE AND EXTREME-ULTRAVIOLET INTENSITY IN A CORONAL PROMINENCE CAVITY AND STREAMER

    SciTech Connect

    Kucera, T. A.; Tripathi, D.

    2012-09-20

    We analyze the temperature and EUV line emission of a coronal cavity and surrounding streamer in terms of a morphological forward model. We use a series of iron line ratios observed with the Hinode Extreme-ultraviolet Imaging Spectrograph (EIS) on 2007 August 9 to constrain temperature as a function of altitude in a morphological forward model of the streamer and cavity. We also compare model predictions to the EIS EUV line intensities and polarized brightness (pB) data from the Mauna Loa Solar Observatory (MLSO) Mark 4 K-coronameter. This work builds on earlier analysis using the same model to determine geometry of and density in the same cavity and streamer. The fit to the data with altitude-dependent temperature profiles indicates that both the streamer and cavity have temperatures in the range 1.4-1.7 MK. However, the cavity exhibits substantial substructure such that the altitude-dependent temperature profile is not sufficient to completely model conditions in the cavity. Coronal prominence cavities are structured by magnetism so clues to this structure are to be found in their plasma properties. These temperature substructures are likely related to structures in the cavity magnetic field. Furthermore, we find that the model overestimates the EUV line intensities by a factor of 4-10, without overestimating pB. We discuss this difference in terms of filling factors and uncertainties in density diagnostics and elemental abundances.

  20. A Molecular- and Nano-Electronics Test (MONET) platform fabricated using extreme ultraviolet lithography.

    SciTech Connect

    Dentinger, Paul M.; Cardinale, Gregory F.; Hunter, Luke L.; Talin, Albert Alec

    2003-12-01

    We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fabricated, the platform includes nominal electrode gaps of 0 nm, 40 nm, 60 nm, and 80 nm. Additional variation in electrode gap is achieved by controlling the exposure conditions, such as dose and focus. To enable EUVL based nanofabrication, we develop a novel bi-level photoresist process. The bi-level photoresist consists of a combination of a commercially available polydimethylglutarimide (PMGI) bottom layer and an experimental EUVL photoresist top (imaging) layer. We measure the sensitivity of PMGI to EUV exposure dose as a function of photoresist pre-bake temperature, and using this data, optimize a metal lift-off process. Reliable fabrication of 700 Angstrom thick Au structures with sub-1000 Angstrom critical dimensions is achieved, even without the use of a Au adhesion layer, such as Ti. Several test platforms are used to characterize electrical properties of organic molecules deposited as self assembled monolayers.

  1. Imaging extreme ultraviolet spectrometer employing a single toroidal diffraction grating: the initial evaluation.

    PubMed

    Huber, M C; Timothy, J G; Morgan, J S; Lemaitre, G; Tondello, G; Jannitti, E; Scarin, P

    1988-08-15

    A high-efficiency extreme ultraviolet (EUV) imaging spectrometer has been constructed and tested. The spectrometer employs a concave toroidal grating illuminated at normal incidence in a Rowland circle mounting and has only one reflecting surface. The toroidal grating has been fabricated by a new technique employing an elastically deformable submaster grating which is replicated in a spherical form and then mechanically distorted to produce the desired aspect ratio of the toroidal surface for stigmatic imaging over the selected wavelength range. The fixed toroidal grating used in the spectrometer is then replicated from this surface. Photographic tests and initial photoelectric tests with a 2-D pulse-counting detector system have verified the image quality of the toroidal grating at wavelengths near 600 A. The results of these initial tests are described in detail, and the basic designs of two instruments which could employ the imaging spectrometer for astrophysical investigations in space are briefly described, namely, a high-resolution EUV spectroheliometer for studies of the solar chromosphere, transition region, and corona and an EUV spectroscopic telescope for studies of nonsolar objects. PMID:20539406

  2. CITIUS: An infrared-extreme ultraviolet light source for fundamental and applied ultrafast science

    SciTech Connect

    Grazioli, C.; Gauthier, D.; Ivanov, R.; De Ninno, G.; Callegari, C.; Spezzani, C.; Ciavardini, A.; Coreno, M.; Frassetto, F.; Miotti, P.; Poletto, L.; Golob, D.; Kivimäki, A.; Mahieu, B.; Bučar, B.; Merhar, M.; Polo, E.; Ressel, B.

    2014-02-15

    We present the main features of CITIUS, a new light source for ultrafast science, generating tunable, intense, femtosecond pulses in the spectral range from infrared to extreme ultraviolet (XUV). The XUV pulses (about 10{sup 5}-10{sup 8} photons/pulse in the range 14-80 eV) are produced by laser-induced high-order harmonic generation in gas. This radiation is monochromatized by a time-preserving monochromator, also allowing one to work with high-resolution bandwidth selection. The tunable IR-UV pulses (10{sup 12}-10{sup 15} photons/pulse in the range 0.4-5.6 eV) are generated by an optical parametric amplifier, which is driven by a fraction of the same laser pulse that generates high order harmonics. The IR-UV and XUV pulses follow different optical paths and are eventually recombined on the sample for pump-probe experiments. We also present the results of two pump-probe experiments: with the first one, we fully characterized the temporal duration of harmonic pulses in the time-preserving configuration; with the second one, we demonstrated the possibility of using CITIUS for selective investigation of the ultra-fast dynamics of different elements in a magnetic compound.

  3. Experiences with thin film filter development for the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Vedder, P. W.; Siegmund, O. H. W.

    1993-01-01

    The design, development, and optimization of the thin film filters used on the Extreme Ultraviolet Explorer (EUVE) Satellite to define the EUV wavelength bandpasses of the individual instruments was a complicated task. The bandpasses had to be optimized for the astrophysical goals of the EUVE mission and constrained by the strong geocoronal EUV background emission. Materials with optical constants that met these requirements had to be found and tested. In many cases these materials were not compatible or were not strong enough to survive the intense vibrations of a rocket launch. Other effects, such as photoelectron 'halo' produced in the filters, were not discovered until flight qualification. The final set of flight filters included: lexan/boron, aluminum/carbon, titanium/antimony/aluminum, and tin/silicon monoxide. This paper discusses the lessons learned in the development of these filters, including the optimization process, material interactions and problems, calibration techniques, vibration susceptibility, thermal tests, and photoelectron emission. We feel the experiences gained over the last 10 years creating the filter sets for EUVE will be invaluable for future missions that use thin film filters.

  4. Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Murtaza Hassan, Syed; Harilal, Sivanandan S.; Hassanein, Ahmed; Endo, Akira; Mocek, Tomas

    2014-05-15

    We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

  5. THE EXTREME ULTRAVIOLET DEFICIT AND MAGNETICALLY ARRESTED ACCRETION IN RADIO-LOUD QUASARS

    SciTech Connect

    Punsly, Brian

    2014-12-20

    The Hubble Space Telescope composite quasar spectra presented in Telfer et al. show a significant deficit of emission in the extreme ultraviolet for the radio-loud component of the quasar population (RLQs) compared to the radio-quiet component of the quasar population. The composite quasar continuum emission between 1100 Å and ∼580 Å is generally considered to be associated with the innermost regions of the accretion flow onto the central black hole. The deficit between 1100 Å and 580 Å in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. It is proposed that this can be the result of islands of large-scale magnetic flux in RLQs that are located close to the central black hole that remove energy from the accretion flow as Poynting flux (sometimes called magnetically arrested accretion). These magnetic islands are natural sites for launching relativistic jets. Based on the Telfer et al. data and the numerical simulations of accretion flows in Penna et al., the magnetic islands are concentrated between the event horizon and an outer boundary of <2.8 M (in geometrized units) for rapidly rotating black holes and <5.5 M for modestly rotating black holes.

  6. Characterization of a laser-plasma extreme-ultraviolet source using a rotating cryogenic Xe target

    NASA Astrophysics Data System (ADS)

    Amano, S.; Masuda, K.; Shimoura, A.; Miyamoto, S.; Mochizuki, T.

    2010-10-01

    A laser-plasma source for extreme-ultraviolet (EUV) light that uses a rotating cryogenic solid-state Xe target has been characterized. We focused on parameters at the wavelength of 13.5 nm with 2% bandwidth required for an EUV lithography source and investigated improvements of the conversion efficiency (CE). With the drum rotating, there was an increase in CE and less fast ions compared with the case for the drum at rest. It is considered that the Xe gas on the target surface can produce optimal-scale plasma, and satellite emission lines in Xe plasma effectively increase the EUV intensity, and the ion number is decreased by the gas curtain effect. The dependence of CE on the laser wavelength, laser energy and intensity also studied. As a result, the maximum CE was 0.9% at 13.5 nm with 2% bandwidth under the optimal condition. By continuous irradiation of a Nd:YAG slab laser at a repetition rate of 320 Hz and an average power of 110 W, the target continuously generated EUV light with an average power of 1 W at 13.5 nm with 2% bandwidth. The achieved performances provide valuable information for the design of a future EUV lithography source.

  7. Deprotection blue in extreme ultraviolet photoresists: influence of base loading and post-exposure bake temperture

    SciTech Connect

    Anderson, Christopher N.; Naulleau, Patrick P.

    2008-06-02

    The deprotection blur of Rohm and Haas XP 5435, XP 5271, and XP5496 extreme ultraviolet photoresists has been determined as their base weight percent is varied. They have also determined the deprotection blur of TOK EUVR P1123 photoresist as the post-exposure bake temperature is varied from 80 C to 120 C. In Rohm and Haas XP 5435 and XP5271 resists 7x and 3x (respective) increases in base weight percent reduce the size of successfully patterned 1:1 line-space features by 16 nm and 8 nm with corresponding reductions in deprotection blur of 7 nm and 4 nm. In XP 5496 a 7x increase in base weight percent reduces the size of successfully patterned 1:1 line-space features from 48 nm to 38 nm without changing deprotection blur. In TOK EUVR P1123 resist, a reduction in post-exposure bake temperature from 100 C to 80 C reduces deprotection blur from 21 nm to 10 nm and reduces patterned LER from 4.8 nm to 4.1 nm.

  8. Electron impact excitation collision strengths for extreme ultraviolet lines of Fe VII

    SciTech Connect

    Tayal, S. S.; Zatsarinny, O. E-mail: oleg.zatsarinny@drake.edu

    2014-06-10

    Extensive calculations have been performed for electron impact excitation collision strengths and oscillator strengths for the Fe VII extreme ultraviolet lines of astrophysical importance. The collision strengths for fine-structure transitions are calculated in the B-spline Breit-Pauli R-matrix approach. The target wavefunctions have been calculated in the multiconfiguration Hartree-Fock method with term-dependent non-orthogonal orbitals. The close-coupling expansion includes 189 fine-structure levels of Fe VII belonging to terms of the ground 3p {sup 6}3d {sup 2} and excited 3p {sup 5}3d {sup 3}, 3p {sup 6}3d4l, 3p {sup 6}3d5s, and 3p {sup 6}3d5p configurations. The effective collision strengths are determined from the electron excitation collision strengths by integration over a Maxwellian distribution of electron velocities. The effective collision strengths are provided for 17766 fine-structure transitions at electron temperatures from 10{sup 4} to 10{sup 7} K. Our results normally agree with the previous R-matrix frame-transformation calculations by Witthoeft and Badnell. However, there are important differences for some transitions with the previous calculations. The corrections to the previous results are mainly due to more extensive expansions for the Fe VII target states.

  9. Extreme-ultraviolet polarimeter utilizing laser-generated high-order harmonics.

    PubMed

    Brimhall, Nicole; Turner, Matthew; Herrick, Nicholas; Allred, David D; Turley, R Steven; Ware, Michael; Peatross, Justin

    2008-10-01

    We describe an extreme-ultraviolet (EUV) polarimeter that employs laser-generated high-order harmonics as the light source. The polarimeter is designed to characterize materials and thin films for use with EUV light. Laser high harmonics are highly directional with easily rotatable linear polarization, not typically available with other EUV sources. The harmonics have good wavelength coverage, potentially spanning the entire EUV from a few to a hundred nanometers. Our instrument is configured to measure reflectances from 14 to 30 nm and has approximately 180 spectral resolution (lambda/Delta lambda). The reflection from a sample surface can be measured over a continuous range of incident angles (5 degrees-75 degrees). A secondary 14 cm gas cell attenuates the harmonics in a controlled way to keep signals within the linear dynamic range of the detector, comprised of a microchannel plate coupled to a phosphorous screen and charge coupled device camera. The harmonics are produced using approximately 10 mJ, approximately 35 fs, and approximately 800 nm laser pulses with a repetition rate of 10 Hz. Per-shot energy monitoring of the laser discriminates against fluctuations. The polarimeter reflectance data agree well with data obtained at the Advanced Light Source Synchrotron (Beamline 6.3.2).

  10. STUDY OF SOLAR ENERGETIC PARTICLE ASSOCIATIONS WITH CORONAL EXTREME-ULTRAVIOLET WAVES

    SciTech Connect

    Park, Jinhye; Moon, Y.-J.; Innes, D. E.; Bucik, R.; Kahler, S. W.

    2015-07-20

    We study the relationship between large gradual solar energetic particle (SEP) events and associated extreme-ultraviolet (EUV) wave properties in 16 events that occurred between 2010 August and 2013 May and were observed by SDO, the Solar and Heliospheric Observatory (SOHO), and/or STEREO. We determine onset times, peak times, and peak fluxes of the SEP events in the SOHO/ERNE and STEREO/LET proton channels (6–10 MeV). The EUV wave arrival times and their speeds from the source sites to the spacecraft footpoints in the photosphere, which are magnetically connected to the spacecraft by Parker spiral and potential fields, are determined by spacetime plots from the full-Sun heliographic images created by combining STEREO-A and STEREO-B 195 Å and SDO 193 Å images. The SEP peak fluxes increase with the EUV wave speeds, and the SEP spectral indices become harder with the speeds. This shows that higher energetic particle fluxes are associated with faster EUV waves, which are considered as the lateral expansions of coronal-mass-ejection-driven shocks in the low corona.

  11. DIET Processes on Ruthenium Surfaces Related to Extreme Ultraviolet Lithography (EUVL)

    SciTech Connect

    Yakshinskiy, B.; Wasielewski, R; Loginova, E; Hedhili, M; Madey, T

    2008-01-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions (high vacuum, and 13.5 nm (92 eV) photons). Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H{sub 2}O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is 6 x 10{sup -19} cm{sup 2}. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is 0.02 electrons/photon at 92 eV.

  12. Opto-mechanisms design of extreme-ultraviolet camera onboard Chang E lunar lander.

    PubMed

    Li, Zhaohui; Chen, Bo; Song, Kefei; Wang, Xiaodong; Liu, Shijie; Yang, Liang; Hu, Qinglong; Qiao, Ke; Zhang, Liping; Wu, Guodong; Yu, Ping

    2014-06-30

    The extreme-ultraviolet camera mounted on the Lander of China Chang-E lunar exploration project launched in 2013 is the first instrument used to imaging from the lunar surface to the whole plasmasphere around the earth. Taking into account both the lunar environment conditions and the weight and volume constraints, a single spherical mirror and a spherical microchannel plate detector make up the compact optical system. An optimized opto-mechanical design was presented using Finite Element Analysis Model, and the detail design for the important assemblies of the 2-axis platform, the primary mirror, the aperture door mechanism and MCP detector were all specially addressed for their environmental adaptability and reliability. Tests of mechanical characteristics have demonstrated that the position and pointing accuracy and its stability meets the operation requirements of 2'. Vibration results have shown that the EUVC has adequate stiffness and strength safety margin to survive in launch and the moon environments. The imaging performance with the resolution of 0.08° is measured after vibration, in agreement with the predicted performance. PMID:24977848

  13. Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics

    NASA Astrophysics Data System (ADS)

    Bozorg-Grayeli, Elah; Li, Zijian; Asheghi, Mehdi; Delgado, Gil; Pokrovsky, Alexander; Panzer, Matthew; Wack, Daniel; Goodson, Kenneth E.

    2012-10-01

    Extreme ultraviolet (EUV) lithography requires nanostructured optical components, whose reliability can be influenced by radiation absorption and thermal conduction. Thermal conduction analysis is complicated by sub-continuum electron and phonon transport and the lack of thermal property data. This paper measures and interprets thermal property data, and their evolution due to heating exposure, for Mo/Si EUV mirrors with 6.9 nm period and Mo/Si thickness ratios of 0.4/0.6 and 0.6/0.4. We use time-domain thermoreflectance and the 3ω method to estimate the thermal resistance between the Ru capping layer and the Mo/Si multilayers (RRu-Mo/Si = 1.5 m2 K GW-1), as well as the out-of-plane thermal conductivity (kMo/Si 1.1 W m-1 K-1) and thermal anisotropy (η = 13). This work also reports the impact of annealing on thermal conduction in a co-deposited MoSi2 layer, increasing the thermal conductivity from 1.7 W m-1 K-1 in the amorphous phase to 2.8 W m-1 K-1 in the crystalline phase.

  14. Extreme Ultraviolet Explorer observations of the magnetic cataclysmic variable RE 1938-461

    NASA Technical Reports Server (NTRS)

    Warren, John K.; Vallerga, John V.; Mauche, Christopher W.; Mukai, Koji; Siegmund, Oswald H. W.

    1993-01-01

    The magnetic cataclysmic variable RE 1938-461 was observed by the Extreme Ultraviolet Explorer (EUVE) Deep Survey instrument on 1992 July 8-9 during in-orbit calibration. It was detected in the Lexan/ boron (65-190 A) band, with a quiescent count rate of 0.0062 +/- 0.0017/s, and was not detected in the aluminum/carbon (160-360 A) band. The Lexan/boron count rate is lower than the corresponding ROSAT wide-field camera Lexan/boron count rate. This is consistent with the fact that the source was in a low state during an optical observation performed just after the EUVE observation, whereas it was in an optical high state during the ROSAT observation. The quiescent count rates are consistent with a virtual cessation of accretion. Two transient events lasting about 1 hr occurred during the Lexan/boron pointing, the second at a count rate of 0.050 +/- 0.006/s. This appears to be the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. We propose two possible explanations for the transient events.

  15. Extreme Ultraviolet Explorer deep survey observations of a large flare on AU Microscopii

    NASA Technical Reports Server (NTRS)

    Cully, Scott L.; Siegmund, Oswald H. W.; Vedder, Peter W.; Vallerga, John V.

    1993-01-01

    We have made the first extended observation of a stellar flare in the EUV with 100 s time resolution. The flare was detected on AU Mic by the Extreme Ultraviolet Explorer satellite at 12:38 UT on 1992 July 15 during a 4 d observation from 1992 July 14 to 18. This was a large flare detected in the Lexan/boron (65-190 A) band with an observed peak count rate of 7.0 +/- 0.5 counts/s, corresponding to a peak luminosity of 10 exp 30 erg/s in the Lexan/boron bandpass. This is significantly above the measured quiescent level of 0.4 +/- 0.2 counts/s. The flare consisted of a sharp peak lasting about 2 hr, followed by a decaying tail that lasted more than a day. The total EUV energy of the event is estimated to be 3 x 10 exp 34 ergs. A second, smaller flare was also observed and is described. We conclude that the large emission measures on order of 6 x 10 exp 53/cu cm are due to large volumes with characteristic length scales of order the stellar radius. We compare these EUV observations with stellar flare observations in other bandpasses and estimate the likelihood of seeing similar flares in future observations.

  16. Relationship between extreme ultraviolet microflares and small-scale magnetic fields in the quiet Sun

    NASA Astrophysics Data System (ADS)

    Jiang, Fayu; Zhang, Jun; Yang, Shuhong

    2015-06-01

    Microflares are small dynamic signatures observed in X-ray and extreme-ultraviolet channels. Because of their impulsive emission enhancements and wide distribution, they are thought to be closely related to coronal heating. By using the high-resolution 171 Å images from the Atmospheric Imaging Assembly and the lines-of-sight magnetograms obtained by the Helioseismic and Magnetic Imager on board the Solar Dynamics Observatory, we trace 10794 microflares in a quiet region near the disk center with a field of view of 960″ × 1068″ during 24 hr. The microflares have an occurrence rate of 4.4 × 103 hr-1 extrapolated over the whole Sun. Their average brightness, size, and lifetime are 1.7I0 (of the quiet Sun), 9.6 Mm2, and 3.6 min, respectively. There exists a mutual positive correlation between the microflares' brightness, area, and lifetime. In general, the microflares distribute uniformly across the solar disk, but form network patterns locally, which are similar to and matched with the magnetic network structures. Typical cases show that the microflares prefer to occur in magnetic cancellation regions of network boundaries. We roughly calculate the upper limit of energy flux supplied by the microflares and find that the result is still a factor of ˜ 15 below the coronal heating requirement.

  17. Line Edge Roughness Reduction Using Resist Reflow Process for 22 nm Node Extreme Ultraviolet Lithography

    NASA Astrophysics Data System (ADS)

    Cho, In Wook; Kim, Hyunsu; You, Jee-Hye; Oh, Hye-Keun

    2010-03-01

    Extreme ultraviolet lithography (EUVL) has been developed and studied for a sub-22 nm semiconductor device. It is difficult to obtain a smooth sub-22 nm pattern because line edge roughness (LER) and linewidth roughness (LWR) cannot be controlled well. According to the 2008 ITRS roadmap, LER has to be below 1.3 nm to achieve a 22 nm node for EUVL. In our previous work, the resist reflow process (RRP), in which the resist is baked above the glass transition temperature (Tg), was very helpful for reducing LER and LWR for EUVL. LER and LWR could be decreased from ˜6 to ˜1 nm. As RRP time progresses, however, the critical dimension could become wider because the developed resist can flow more easily when the temperature is above Tg. Therefore, another method is suggested to solve this problem. The developed resist, which is intentionally designed with a 1:3 line and space (L/S) (11:33 nm) pattern, is baked above Tg. As a result, LER and LWR can be smoothed by RRP and we could achieve a 22 nm 1:1 L/S pattern with a small LER.

  18. Boundary integral spectral element method analyses of extreme ultraviolet multilayer defects.

    PubMed

    Niu, Jun; Luo, Ma; Fang, Yuan; Liu, Qing Huo

    2014-10-01

    Extreme ultraviolet (EUV) lithography is an emerging technology for high-density semiconductor patterning. Multilayer distortion caused by mask defects is regarded as one of the critical challenges of EUV lithography. To simulate the influence of the defected nanoscale structures with high accuracy and efficiency, we have developed a boundary integral spectral element method (BI-SEM) that combines the SEM with a set of surface integral equations. The SEM is used to solve the interior computational domain, while the open boundaries are truncated by the surface integral equations. Both two-dimensional (2D) and three-dimensional (3D) EUV cases are simulated. Through comparing the performance of this method with the conventional finite element method (FEM), it is shown that the proposed BI-SEM can greatly decrease both the memory cost and the computation time. For typical 2D problems, we show that the BI-SEM is 11 and 1.25 times more efficient than the FEM in terms of memory and CPU time, respectively, while for 3D problems, these factors are over 14 and 2, respectively, for smaller problems; realistic 3D problems that cannot be solved by the conventional FEM can be accurately simulated by the BI-SEM. PMID:25401246

  19. Influence of laser pulse duration on extreme ultraviolet and ion emission features from tin plasmas

    SciTech Connect

    Roy, A. E-mail: aroy@barc.gov.in; Harilal, S. S.; Polek, M. P.; Hassan, S. M.; Hassanein, A.; Endo, A.

    2014-03-15

    We investigated the role of laser pulse duration and intensity on extreme ultraviolet (EUV) generation and ion emission from a laser produced Sn plasma. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm Nd:YAG laser pulses with varying pulse duration (5–20 ns) and intensity. Experimental results performed at CMUXE indicate that the conversion efficiency (CE) of the EUV radiation strongly depend on laser pulse width and intensity, with a maximum CE of ∼2.0% measured for the shortest laser pulse width used (5 ns). Faraday Cup ion analysis of Sn plasma showed that the ion flux kinetic profiles are shifted to higher energy side with the reduction in laser pulse duration and narrower ion kinetic profiles are obtained for the longest pulse width used. However, our initial results showed that at a constant laser energy, the ion flux is more or less constant regardless of the excitation laser pulse width. The enhanced EUV emission obtained at shortest laser pulse duration studied is related to efficient laser-plasma reheating supported by presence of higher energy ions at these pulse durations.

  20. Corrective finishing of extreme ultraviolet photomask blanks by precessed bonnet polisher.

    PubMed

    Beaucamp, Anthony; Namba, Yoshiharu; Charlton, Phillip

    2014-05-10

    The progressive transition from Excimer to extreme ultraviolet (EUV) lithography is driving a need for flatter and smoother photomask blanks. It is, however, proving difficult to meet the next-generation specification with the conventional chemical mechanical polishing technology commonly used for finishing photomask blanks. This paper reports on the application of subaperture computer numerical control precessed bonnet polishing technology to the corrective finishing of photomask substrates for EUV lithography. Full-factorial analysis was used to identify process parameters capable of delivering microroughness below 0.5 nm rms while retaining relatively high removal rates. Experimental results show that masks prepolished to 300-600 nm peak-to-valley (P-V) flatness by chemical/mechanical polishing can then be improved down to 50-100 nm P-V flatness using the automated technology described in this paper. A series of edge polishing experiments also hints at the possibility of increasing the quality area beyond the 142 mm square defined in the official EUV photomask specification. PMID:24922029

  1. Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges.

    PubMed

    Sertsu, M G; Nardello, M; Giglia, A; Corso, A J; Maurizio, C; Juschkin, L; Nicolosi, P

    2015-12-10

    Accurate measurements of optical properties of multilayer (ML) mirrors and chemical compositions of interdiffusion layers are particularly challenging to date. In this work, an innovative and nondestructive experimental characterization method for multilayers is discussed. The method is based on extreme ultraviolet (EUV) reflectivity measurements performed on a wide grazing incidence angular range at an energy near the absorption resonance edge of low-Z elements in the ML components. This experimental method combined with the underlying physical phenomenon of abrupt changes of optical constants near EUV resonance edges enables us to characterize optical and structural properties of multilayers with high sensitivity. A major advantage of the method is to perform detailed quantitative analysis of buried interfaces of multilayer structures in a nondestructive and nonimaging setup. Coatings of Si/Mo multilayers on a Si substrate with period d=16.4  nm, number of bilayers N=25, and different capping structures are investigated. Stoichiometric compositions of Si-on-Mo and Mo-on-Si interface diffusion layers are derived. Effects of surface oxidation reactions and carbon contaminations on the optical constants of capping layers and the impact of neighboring atoms' interactions on optical responses of Si and Mo layers are discussed. PMID:26836858

  2. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.

    PubMed

    Ashby, Paul D; Olynick, Deirdre L; Ogletree, D Frank; Naulleau, Patrick P

    2015-10-14

    Extreme ultraviolet lithography (EUVL) is the leading technology for enabling miniaturization of computational components over the next decade. Next-generation resists will need to meet demanding performance criteria of 10 nm critical dimension, 1.2 nm line-edge roughness, and 20 mJ cm(-2) exposure dose. Here, the current state of the development of EUV resist materials is reviewed. First, pattern formation in resist materials is described and the Hansen solubility sphere (HSS) is used as a framework for understanding the pattern-development process. Then, recent progress in EUVL resist chemistry and characterization is discussed. Incremental advances are obtained by transferring chemically amplified resist materials developed for 193 nm lithography to EUV wavelengths. Significant advances will result from synthesizing high-absorbance resist materials using heavier atoms. In the framework of the HSS model, these materials have significant room for improvement and thus offer great promise as high-performance EUV resists for patterning of sub-10 nm features. PMID:26079187

  3. Extreme ultraviolet spectroscopy and modeling of Cu on the SSPX Spheromak and laser plasma 'Sparky'

    SciTech Connect

    Weller, M. E.; Safronova, A. S.; Kantsyrev, V. L.; Safronova, U. I.; Petkov, E. E.; Wilcox, P. G.; Osborne, G. C.; Clementson, J.; Beiersdorfer, P.

    2012-10-15

    Impurities play a critical role in magnetic fusion research. In large quantities, impurities can cool and dilute plasma creating problems for achieving ignition and burn; however in smaller amounts the impurities could provide valuable information about several plasma parameters through the use of spectroscopy. Many impurity ions radiate within the extreme ultraviolet (EUV) range. Here, we report on spectra from the silver flat field spectrometer, which was implemented at the Sustained Spheromak Physics experiment (SSPX) to monitor ion impurity emissions. The chamber within the SSPX was made of Cu, which makes M-shell Cu a prominent impurity signature. The Spect3D spectral analysis code was utilized to identify spectral features in the range of 115-315 A and to more fully understand the plasma conditions. A second set of experiments was carried out on the compact laser-plasma x-ray/EUV facility 'Sparky' at UNR, with Cu flat targets used. The EUV spectra were recorded between 40-300 A and compared with results from SSPX.

  4. Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications

    SciTech Connect

    Freeman, J. R.; Harilal, S. S.; Hassanein, A.

    2011-10-15

    Laser-produced plasmas (LPP) from Sn targets are seriously considered to be the light source for extreme ultraviolet (EUV) next generation lithography, and optimization of such a source will lead to improved efficiency and reduced cost of ownership of the entire lithography system. We investigated the role of reheating a prepulsed plasma and its effect on EUV conversion efficiency (CE). A 6 ns, 1.06 {mu}m Nd:yttrium aluminum garnet laser was used to generate the initial plasma that was then reheated by a 40 ns, 10.6 {mu}m CO{sub 2} laser to generate enhanced EUV emission from a planar Sn target. The effects of prepulsed laser intensity and delay timings between the prepulsed and the pumping pulse were investigated to find the optimal pre-plasma conditions before the pumping pulse. The initial optimization of these parameters resulted in 25% increase in CE from the tin LPP. The cause of increased EUV emission was identified from EUV emission spectra and ion signal data.

  5. Curved focal plane extreme ultraviolet detector array for a EUV camera on CHANG E lander.

    PubMed

    Ni, Q; Song, K; Liu, S; He, L; Chen, B; Yu, W

    2015-11-30

    A novel curved focal plane extreme ultraviolet (EUV) detector array designed for a moon-based EUV camera is demonstrated. The curved focal plane detector array operating in a pulse-counting mode consists of a curved microchannel plate (MCP) stack and an induced charge wedge-strip anode (WSA). The curved MCP is fabricated by firstly thermally slumping of the MCPs, and then followed by optical polishing and core glass etching. By using this technology, curved MCPs with a length-to-diameter (L/D) ratio of 80:1 and a radius of curvature of 150 mm have been successfully achieved. The performance of the curved MCP detector is fully characterized in terms of the background noise, pulse height distribution, gain, image linearity and spatial resolution. It is measured that a spatial resolution of 7.13 lp/mm can be achieved with a background noise of less than 0.3 counts/cm2⋅s. The characterization results indicate that the curved focal plane detector can fulfill the requirements of the moon-based EUV camera. PMID:26698708

  6. Z{sub eff} measurement using extreme ultraviolet bremsstrahlung emission in LHD

    SciTech Connect

    Zhou Hangyu; Dong Chunfeng; Morita, Shigeru; Goto, Motoshi; Yanagibayashi, Jun; Hasuo, Masahiro

    2010-10-15

    Radial profile measurement of Z{sub eff} using visible bremsstrahlung (5300 A) in the Large Helical Device (LHD) has often encountered difficulties because the intensity profile was largely deformed by the nonuniform visible bremsstrahlung emissions from the edge ergodic layer surrounding the core plasma. A space-resolved flat-field extreme ultraviolet (EUV) spectrometer has been newly adopted to measure the Z{sub eff} profile using the EUV bremsstrahlung continuum in the wavelength range of 70-75 A. The EUV bremsstrahlung intensity profiles have been measured and checked for all the magnetic configurations with totally different magnetic field structures in the ergodic layer of LHD. It is found that the nonuniform bremsstrahlung emission from the thick ergodic layer can be entirely eliminated by use of the EUV emission with relatively high photon energy of 170 eV. As a result, the Z{sub eff} profile can be successfully measured for most of discharges regardless of magnetic field structures of the ergodic layer. The Z{sub eff} profiles measured in the EUV range are compared with those measured in the visible range at a magnetic configuration with the thinnest ergodic layer thickness. The result verifies that the use of the EUV bremsstrahlung continuum is an alternative way for the Z{sub eff} measurement in toroidal plasmas with nonuniform bremsstrahlung emissions at the edge. Typical results from the EUV bremsstrahlung measurement are presented showing a fairly flat Z{sub eff} profile with error bars of {+-}14%.

  7. Thermalization of electrons in decaying extreme ultraviolet photons induced low pressure argon plasma

    NASA Astrophysics Data System (ADS)

    Beckers, J.; van der Horst, R. M.; Osorio, E. A.; Kroesen, G. M. W.; Banine, V. Y.

    2016-06-01

    We monitored—in the pressure range: 0.5–15 Pa—the electron temperature in decaying plasmas induced in argon gas by pulsed irradiation with extreme ultraviolet (EUV) photons with wavelengths closely around 13.5 nm. For this purpose, temporal measurements of the space-averaged and electric field weighted electron density after pulsed EUV irradiation are combined with an ambipolar diffusion model of the plasma. Results demonstrate that electrons are thermalized to room temperature before the plasma has fully expanded to the chamber walls for pressures of 3 Pa and higher. At pressures below 3 Pa, the electron temperature was found to be up to 0.1 eV above room temperature which is explained by the fact that plasma expansion is too quick for the electrons to fully thermalize. The comparison between plasma expansion duration towards a surface, plasma decay at a surface and time needed for thermalization and cooling of electrons is essential for designers of EUV lithography tools and EUV sources since the temperature of electrons dictates many fundamental physical processes.

  8. Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering

    NASA Astrophysics Data System (ADS)

    Beyene, Girum A.; Tobin, Isaac; Juschkin, Larissa; Hayden, Patrick; O’Sullivan, Gerry; Sokell, Emma; Zakharov, Vassily S.; Zakharov, Sergey V.; O’Reilly, Fergal

    2016-06-01

    Extreme ultraviolet (EUV) light generation by hybrid laser-assisted vacuum arc discharge plasmas, utilizing Sn-coated rotating-disc-electrodes, was investigated. The discharge was initiated by localized ablation of the liquid tin coating of the cathode disc by a laser pulse. The laser pulse, at 1064 nm, was generated by Nd:YAG lasers with variable energy from 1 to 100 mJ per pulse. The impact of shortening the laser pulse from 7 ns to 170 ps on the EUV generation has been investigated in detail. The use of ps pulses resulted in an increase in emission of EUV radiation. With a fixed discharge energy of ~4 J, the EUV conversion efficiency tends to plateau at ~2.4  ±  0.25% for the ps laser pulses, while for the ns pulses, it saturates at ~1.7  ±  0.3%. Under similar discharge and laser energy conditions, operating the EUV source with the ps-triggering resulted also in narrower spectral profiles of the emission in comparison to ns-triggering. The results indicate an advantage in using ps-triggering in laser-assisted discharges to produce brighter plasmas required for applications such as metrology.

  9. On the Importance of the Flare's Late Phase for the Solar Extreme Ultraviolet Irradiance

    NASA Technical Reports Server (NTRS)

    Woods, Thomas N.; Eparvier, Frank; Jones, Andrew R.; Hock, Rachel; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Bailey, Scott; Tobiska, W. Kent; Schrijver, Carolus J.; Webb, David F.; Warren, Harry

    2011-01-01

    The new solar extreme ultraviolet (EUV) irradiance observations from NASA Solar Dynamics Observatory (SDO) have revealed a new class of solar flares that are referred to as late phase flares. These flares are characterized by the hot 2-5 MK coronal emissions (e.g., Fe XVI 33.5 nm) showing large secondary peaks that appear many minutes to hours after an eruptive flare event. In contrast, the cool 0.7-1.5 MK coronal emissions (e.g., Fe IX 17.1 nm) usually dim immediately after the flare onset and do not recover until after the delayed second peak of the hot coronal emissions. We refer to this period of 1-5 hours after the fl amrea sin phase as the late phase, and this late phase is uniquely different than long duration flares associated with 2-ribbon flares or large filament eruptions. Our analysis of the late phase flare events indicates that the late phase involves hot coronal loops near the flaring region, not directly related to the original flaring loop system but rather with the higher post-eruption fields. Another finding is that space weather applications concerning Earth s ionosphere and thermosphere need to consider these late phase flares because they can enhance the total EUV irradiance flare variation by a factor of 2 when the late phase contribution is included.

  10. Materials Modification with Intense Extreme Ultraviolet Pulses from a Compact Laser

    NASA Astrophysics Data System (ADS)

    Grisham, M. E.; Vaschenko, G.; Menoni, C. S.; Juha, L.; Bittner, M.; Pershyn, Yu. P.; Kondratenko, V. V.; Zubarev, E. N.; Vinogradov, A. V.; Artioukov, I. A.; Rocca, J. J.

    In summary, we have realized a series of experiments with a compact 46.9 nm wavelength laser that produces intense pulses of nanosecond duration to study the ablation behavior of metals, common polymers, and Sc/Si multilayers. The key ablation process in polymers is likely to be a radiolysis of the polymer chains by EUV photons, resulting in the formation of numerous small molecular fragments that are subsequently removed from the surface of the samples. The EUV ablation rates for different polymers were found to be almost material independent, ˜ 50 - 400 nm/pulse. In each material EUV irradiation was observed to leave smooth craters with well defined edges and without signs of thermal damage. No threshold behavior was detected in the EUV ablation of the polymers in the range of fluences used in the experiment. In contrast to polymers the irradiation damage in metals and in Sc/Si multilayers is thermal in nature. A damage threshold of 0.08 J/cm2 was measured in the multilayer mirror coatings deposited on Si or borosilicate glass substrates, compared with a measured value of 0.7 J/cm2 for bare Si substrates. These results are relevant to the use of these mirrors with newly developed high-power EUV laser sources and provide a benchmark for their further improvement. In combination, the experiments demonstrate that compact extreme ultraviolet lasers are new tools available for surface modification studies and patterning.

  11. Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

    NASA Astrophysics Data System (ADS)

    Lee, Sang-Ho; Kang, Young-Jae; Park, Jin-Goo; Busnaina, Ahmed A.; Lee, Jong-Myung; Kim, Tae-Hoon; Zhang, Guojing; Eschbach, Florence; Ramamoorthy, Arun

    2005-07-01

    A new dry laser shock wave generated by a Nd:YAG laser was applied to remove nanosized polystyrene latex (PSL) particles on the silicon capping layer of an extreme ultraviolet lithography (EUVL) mask. UV laser was irradiated on the surface before irradiation with laser shock waves to increase the removal efficiency of the organic PSL particles. Owing to the expected damage to the surfaces, the energy of the UV laser was reduced to 8 mJ and the gap distance between the laser shock wave and the surface was increased to 10.5 mm. UV irradiation alone resulted in the removal of 50% of the particles. Exposure to the UV laser three times increased the removal efficiency to 70%. Over 95% particle removal efficiency was found when a laser shock wave was combined with the UV laser. However, the removal efficiency of the particles was below 25% by laser shock wave cleaning alone. Enhanced removal efficiency by UV laser irradiation may be attributed to the photothermal and chemical effects of UV light on the organic PSL particles.

  12. Opto-mechanisms design of extreme-ultraviolet camera onboard Chang E lunar lander.

    PubMed

    Li, Zhaohui; Chen, Bo; Song, Kefei; Wang, Xiaodong; Liu, Shijie; Yang, Liang; Hu, Qinglong; Qiao, Ke; Zhang, Liping; Wu, Guodong; Yu, Ping

    2014-06-30

    The extreme-ultraviolet camera mounted on the Lander of China Chang-E lunar exploration project launched in 2013 is the first instrument used to imaging from the lunar surface to the whole plasmasphere around the earth. Taking into account both the lunar environment conditions and the weight and volume constraints, a single spherical mirror and a spherical microchannel plate detector make up the compact optical system. An optimized opto-mechanical design was presented using Finite Element Analysis Model, and the detail design for the important assemblies of the 2-axis platform, the primary mirror, the aperture door mechanism and MCP detector were all specially addressed for their environmental adaptability and reliability. Tests of mechanical characteristics have demonstrated that the position and pointing accuracy and its stability meets the operation requirements of 2'. Vibration results have shown that the EUVC has adequate stiffness and strength safety margin to survive in launch and the moon environments. The imaging performance with the resolution of 0.08° is measured after vibration, in agreement with the predicted performance.

  13. HOMOLOGOUS EXTREME ULTRAVIOLET WAVES IN THE EMERGING FLUX REGION OBSERVED BY THE SOLAR DYNAMICS OBSERVATORY

    SciTech Connect

    Zheng Ruisheng; Jiang Yunchun; Yang Jiayan; Bi Yi; Hong Junchao; Yang, B.; Yang Dan

    2012-03-01

    Taking advantage of the high temporal and spatial resolution of the Solar Dynamics Observatory (SDO) observations, we present four homologous extreme ultraviolet (EUV) waves within 3 hr on 2010 November 11. All EUV waves emanated from the same emerging flux region (EFR), propagated in the same direction, and were accompanied by surges, weak flares, and faint coronal mass ejections (CMEs). The waves had the basically same appearance in all EUV wavebands of the Atmospheric Imaging Assembly on SDO. The waves propagated at constant velocities in the range of 280-500 km s{sup -1}, with little angular dependence, which indicated that the homologous waves could be likely interpreted as fast-mode waves. The waves are supposed to likely involve more than one driving mechanism, and it was most probable that the waves were driven by the surges, due to their close timing and location relations. We also propose that the homologous waves were intimately associated with the continuous emergence and cancellation of magnetic flux in the EFR, which could supply sufficient energy and trigger the onsets of the waves.

  14. Chang'e-3 Extreme Ultraviolet Camera Observations of the Dynamics of the Earth's Plasmasphere

    NASA Astrophysics Data System (ADS)

    Fok, M. C. H.; Zhang, X.; He, F.; Chen, B.; Wang, H. N.; Shen, C.; Ping, J.; Nakano, S.

    2015-12-01

    The Moon-based Extreme Ultraviolet Camera (EUVC) aboard China's Chang'e-3 (CE-3) lunar lander has successfully imaged the global plasmasphere on the Moon for the first time through detecting the resonantly scattered sunlight by plasmaspheric He+ at 30.4 nm with a spatial resolution of 0.1 RE and a time resolution of 10 min. The characteristics and the analyzing methods of the EUVC images are introduced in detail in this report. The plasmapause locations on the magnetic equator are reconstructed with the Minimum L Algorithm and are quantitatively compared with those extracted from in-situ observations by DMSP, THEMIS, and RBSP satellites. Then the plasmapause evolutions during substorms on February 21 2014 and April 21 2014 are investigated. It is found that the evolutions of plasmapause correlate well in both universal time and magnetic local time with the equatorial boundaries of auroral oval during substorms. During these two cases, the solar-wind-driven convection and the geomagnetic activity are relatively weak and steady, and the plasmapause motions can reliably be attributed to the substorms. It is proposed that correlations between the auroral signatures and the plasmapause motions may be due to the generation and Earthward-propagation of dipolarization front and resultant pitch angle scattering. In future work, we will search more in-situ and remote sensing data in both the plasmasphere and the magnetotail regions to investigate the correlations between the plasmaspheric erosions, the dipolarization fronts, and the energetic ions injections.

  15. Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Habets, Michel; Scholten, Joni; Weiland, Siep; Coene, Wim

    2016-03-01

    The imaging quality of the projection optics of an extreme ultraviolet lithography scanner degrades under the influence of thermally induced deformations of its mirrors. Wavefronts of different reticle points encounter different parts of the deformed mirrors, resulting in a field dependent wavefront error. This paper presents how ideas from multi-conjugate adaptive optics can be used to reduce these thermally induced aberrations. To this end a generic deformable mirror model is implemented. Linear actuator sensitivities are derived directly, based on nominal ray locations and directions, enabling fast prototyping. An integrated opto-thermo-mechanical mirror heating model is used to determine the evolution of thermally induced abberations over time. This transient simulation is used to analyze four different adaptive optics configurations and two different control algorithms. It is shown that by employing the multi-objective goal-attainment method, it is possible to improve the optical performance significantly when compared to minimizing the l2-norm of the total residual wavefront error vector.

  16. At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

    SciTech Connect

    Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik H.; Batson, Phillip; Denham, Paul E.; Jackson, Keith H.; Gullikson, Eric M.; Rekawa, Senajith; Bokor, Jeffrey

    2001-06-10

    At-wavelength interferometric characterization of a new 4x-reduction lithographic-quality extreme ultraviolet (EUV) optical system is described. This state-of-the-art projection optic was fabricated for installation in the EUV lithography Engineering Test Stand (ETS) and is referred to as the ETS Set-2 optic. EUV characterization of the Set-2 optic is performed using the EUV phase-shifting point diffraction interferometer (PS/PDI) installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. This is the same interferometer previously used for the at-wavelength characterization and alignment of the ETS Set-1 optic. In addition to the PS/PDI-based full-field wavefront characterization, we also present wavefront measurements performed with lateral shearing interferometry, the chromatic dependence of the wavefront error, and the system-level pupil-dependent spectral-bandpass characteristics of the optic; the latter two properties are only measurable using at-wavelength interferometry.

  17. Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

    NASA Astrophysics Data System (ADS)

    Benk, Markus P.; Miyakawa, Ryan H.; Chao, Weilun; Wang, Yow-Gwo; Wojdyla, Antoine; Johnson, David G.; Donoghue, Alexander P.; Goldberg, Kenneth A.

    2015-01-01

    The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle Review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet photomask research. SHARP's programmable Fourier synthesis illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP's set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, to improve navigation, and to enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. We discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike phase contrast and different implementations of differential interference contrast (DIC). First results show that Zernike phase contrast can significantly increase the signal from phase defects in SHARP image data, thus improving the sensitivity of the microscope. DIC is effective on a variety of features, including phase defects and intensity speckle from substrate and multilayer roughness. The additional imaging modes are now available to users of the SHARP microscope.

  18. Repair of phase defects in extreme-ultraviolet lithography mask blanks

    SciTech Connect

    Hau-Riege, Stefan P.; Barty, Anton; Mirkarimi, Paul B.; Baker, Sherry; Coy, Michael A.; Mita, Masaaki; Robertson, Vernon E.; Liang, Ted; Stivers, Alan

    2004-12-01

    Phase defects that introduce errors in the printed image are one of the major yield limiters for reticles in extreme-ultraviolet lithography. The basis for a reticle is a mask blank, consisting of an ultra-low-expansion substrate and a reflective multilayer stack that is made up of Mo and Si. A potential methodology for repairing phase defects in these mask blanks is to locally irradiate it with a high-resolution electron beam to induce structural deformations that cancel out the distortion of the multilayer. We present experimental and modeling results that show that the interaction of an electron beam with a mask blank can only be understood when the contraction of the multilayer through silicide formation and substrate compaction, as well as the mechanical response of the mask blank, are considered. One of the consequences is that electron beams with energies around 10 keV that are less than 20 nm in diameter induce depressions in multilayers made up of 50 Mo/Si bilayers that have a surprisingly large diameter of about a micrometer. Our models suggest that these unacceptably large diameters can only be reduced if the compaction of the substrate is prevented.

  19. Study of Solar Energetic Particle Associations with Coronal Extreme-ultraviolet Waves

    NASA Astrophysics Data System (ADS)

    Park, Jinhye; Innes, D. E.; Bucik, R.; Moon, Y.-J.; Kahler, S. W.

    2015-07-01

    We study the relationship between large gradual solar energetic particle (SEP) events and associated extreme-ultraviolet (EUV) wave properties in 16 events that occurred between 2010 August and 2013 May and were observed by SDO, the Solar and Heliospheric Observatory (SOHO), and/or STEREO. We determine onset times, peak times, and peak fluxes of the SEP events in the SOHO/ERNE and STEREO/LET proton channels (6-10 MeV). The EUV wave arrival times and their speeds from the source sites to the spacecraft footpoints in the photosphere, which are magnetically connected to the spacecraft by Parker spiral and potential fields, are determined by spacetime plots from the full-Sun heliographic images created by combining STEREO-A and STEREO-B 195 Å and SDO 193 Å images. The SEP peak fluxes increase with the EUV wave speeds, and the SEP spectral indices become harder with the speeds. This shows that higher energetic particle fluxes are associated with faster EUV waves, which are considered as the lateral expansions of coronal-mass-ejection-driven shocks in the low corona.

  20. Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges.

    PubMed

    Sertsu, M G; Nardello, M; Giglia, A; Corso, A J; Maurizio, C; Juschkin, L; Nicolosi, P

    2015-12-10

    Accurate measurements of optical properties of multilayer (ML) mirrors and chemical compositions of interdiffusion layers are particularly challenging to date. In this work, an innovative and nondestructive experimental characterization method for multilayers is discussed. The method is based on extreme ultraviolet (EUV) reflectivity measurements performed on a wide grazing incidence angular range at an energy near the absorption resonance edge of low-Z elements in the ML components. This experimental method combined with the underlying physical phenomenon of abrupt changes of optical constants near EUV resonance edges enables us to characterize optical and structural properties of multilayers with high sensitivity. A major advantage of the method is to perform detailed quantitative analysis of buried interfaces of multilayer structures in a nondestructive and nonimaging setup. Coatings of Si/Mo multilayers on a Si substrate with period d=16.4  nm, number of bilayers N=25, and different capping structures are investigated. Stoichiometric compositions of Si-on-Mo and Mo-on-Si interface diffusion layers are derived. Effects of surface oxidation reactions and carbon contaminations on the optical constants of capping layers and the impact of neighboring atoms' interactions on optical responses of Si and Mo layers are discussed.

  1. A study of the mechanical vibrations of a table-top extreme ultraviolet interference nanolithography tool.

    PubMed

    Prezioso, S; De Marco, P; Zuppella, P; Santucci, S; Ottaviano, L

    2010-04-01

    A prototype low cost table-top extreme ultraviolet (EUV) laser source (1.5 ns pulse duration, lambda=46.9 nm) was successfully employed as a laboratory scale interference nanolithography (INL) tool. Interference patterns were obtained with a simple Lloyd's mirror setup. Periodic structures on Polymethylmethacrylate/Si substrates were produced on large areas (8 mm(2)) with resolutions from 400 to 22.5 nm half pitch (the smallest resolution achieved so far with table-top EUV laser sources). The mechanical vibrations affecting both the laser source and Lloyd's setup were studied to determine if and how they affect the lateral resolution of the lithographic system. The vibration dynamics was described by a statistical model based on the assumption that the instantaneous position of the vibrating mechanical parts follows a normal distribution. An algorithm was developed to simulate the process of sample irradiation under different vibrations. The comparison between simulations and experiments allowed to estimate the characteristic amplitude of vibrations that was deduced to be lower than 50 nm. The same algorithm was used to reproduce the expected pattern profiles in the lambda/4 half pitch physical resolution limit. In that limit, a nonzero pattern modulation amplitude was obtained from the simulations, comparable to the peak-to-valley height (2-3 nm) measured for the 45 nm spaced fringes, indicating that the mechanical vibrations affecting the INL tool do not represent a limit in scaling down the resolution.

  2. Considerations for a free-electron laser-based extreme-ultraviolet lithography program

    NASA Astrophysics Data System (ADS)

    Hosler, Erik R.; Wood, Obert R.; Barletta, William A.; Mangat, Pawitter J. S.; Preil, Moshe E.

    2015-03-01

    Recent years have seen great strides in the development of extreme ultraviolet (EUV) laser-produced plasma sources. Field deployed EUV exposure tools are now capable of facilitating advanced technology node development. Nevertheless, as the required manufacturing exposure dose scales, EUV sources must follow suit and provide 500- 1000 W to maintain production throughputs. A free-electron laser (FEL) offers a cost effective, single-source alternative for powering an entire EUV lithography program. FEL integration into semiconductor fab architecture will require both unique facility considerations as well as a paradigm shift in lithography operations. Critical accelerator configurations relating to energy recovery, multi-turn acceleration, and operational mode are discussed from engineering/scientific, cost-minimization, and safety perspectives. Furthermore, the individual components of a FEL (electron injector, RF systems, undulator, etc.) are examined with respect to both design and cost, considering existing technology as well as prospective innovations. Finally, FEL development and deployment roadmaps are presented, focusing on manufacturer deployment for the 5 nm or 3 nm technology nodes.[1-3

  3. AN EXTREME ULTRAVIOLET WAVE ASSOCIATED WITH A MICRO-SIGMOID ERUPTION

    SciTech Connect

    Zheng Ruisheng; Jiang Yunchun; Yang Jiayan; Bi Yi; Hong Junchao; Yang Dan; Yang Bo

    2012-07-10

    Taking advantage of the high temporal and spatial resolution of the Solar Dynamics Observatory (SDO) observations, we present an extreme ultraviolet (EUV) wave associated with a micro-sigmoid eruption on 2010 October 21. The micro-sigmoid underwent a typical 'sigmoid-to-arcade' evolution via tether-cutting reconnection, accompanied by a B1.7 flare, a filament eruption, and coronal twin dimmings. In the eruption, the newly formed sigmoidal loops expanded quickly, and the expansion likely triggered an EUV wave. The wave onset was nearly simultaneous with the start of the eruption and the associated flare. The wave had a nearly circular front and propagated at a constant velocity of 270-350 km s{sup -1} with very little angular dependence. Remarkably, in some direction, the wave encountered a small loop and refracted at a higher speed. All the results provide evidences that the wave was a fast-mode magnetohydrodynamic (MHD) wave. Owing to the close temporal and spatial relationship between the wave and the expanding loops, we believe that the wave was most likely triggered by the fast expansion of the newly formed sigmoidal loops, which evolved into the leading front of the invisible micro-coronal mass ejection.

  4. Extreme ultraviolet spectroscopy of the white dwarf photosphere in AM Herculis

    SciTech Connect

    Paerels, F.; Hur, M.Y.; Mauche, C.W.; Heise, J.

    1996-06-01

    We present high-resolution spectroscopy of the stellar photospheric spectrum of the white dwarf in AM Herculis in the 75{endash}120 A band, obtained with the Short-Wavelength Spectrometer on the {ital Extreme}-{ital Ultraviolet} {ital Explorer}. We positively detect ionization edges and absorption lines from highly ionized neon (NeVI, NeVIII). Surprisingly, we do not detect absorption at the OVI 2{ital s}, 2{ital p} edges, which are expected to be the strongest spectral features in this band in an atmosphere of solar composition at the density and temperature expected for the accretion region in this object. There is evidence for limb brightening of the spectrum in egress from eclipse, indicating the presence of a temperature inversion in the X-ray/EUV photosphere. We interpret these results in the context of the classical model for the soft X-ray/EUV emission from AM Her: hard X-ray irradiation of the atmosphere by the accretion shock. {copyright} {ital 1996 The American Astronomical Society.}

  5. Study of impurities in the Tandem Mirror Experiment using extreme-ultraviolet spectroscopy

    SciTech Connect

    Strand, O.T.

    1982-05-12

    Impurities in the Tandem Mirror Experiment (TMX) have been studied using extreme ultraviolet spectroscopy. Three time-resolving absolutely-calibrated normal-incidence monochromators, one on each section of TMX, were used to study the impurity emissions in the wavelength range of 300 A to 1600 A. The instruments on the east end cell and central cell were each capable of obtaining spatially-resolved profiles from 22 chords of the plasma simultaneously while the instrument on the west end cell monitored the central chord. The impurities identified in TMX were carbon, nitrogen, oxygen, and titanium. Emphasis was placed upon determining the impurity densities and radiated power losses of the central cell; results indicate that the impurity concentrations were low - less than 0.4% for each species - and that less than 10% of the total net trapped neutral beam power was lost to radiation. The use of titanium gettering on the central cell walls was observed to decrease the brightnesses of singly- and doubly-ionized carbon and oxygen in the central cell plasma. In the end cells, oxygen was the main impurity with a concentration of about 1.5% and was injected by the neutral beams; the other impurities had concentrations of about 0.5%. Radiation losses from the end cells were negligible.

  6. Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Ray-Chaudhuri, A.K.

    1994-08-01

    The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 {mu}m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 {mu}m.

  7. Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Ray-Chaudhuri, A.K.; Malinowski, M.E.; Stulen, R.H.; Haney, S.J.; Berger, K.W.; Nissen, R.P.; Wilkerson, G.A.; Paul, P.H. ); Bjorkholm, J.E.; Fetter, L.A.; Freeman, R.R.; Himel, M.D.; MacDowell, A.A.; Tennant, D.M.; Wood, O.R. II ); Waskiewicz, W.K.; White, D.L.; Windt, D.L. ); Jewell, T.E. )

    1994-11-01

    The performance of a new 10[times]-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An offset aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 45[degree] turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched, and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of 2 of the design value. Images recorded in poly(methyl methacrylate) and ZEP 520 (Nippon Zeon) resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.

  8. Extreme ultraviolet and x-ray transition wavelengths in Rb XXIV

    NASA Astrophysics Data System (ADS)

    Indu, Khatri; Arun, Goyal; Sunny, Aggarwal; K. Singh, A.; Man, Mohan

    2015-10-01

    Energy levels, radiative rates, oscillator strengths and line strengths are reported for transitions among the lowest 97 levels of the (1s22s22p6) 3s23p2, 3s23p3d, 3s3p3, 3p4, 3s3p23d, and 3s23d2 configurations of Rb XXIV. A multiconfiguration Dirac-Fock (MCDF) method is adopted for the calculations. Radiative rates, oscillator strengths, and line strengths are provided for all electric dipole (E1), magnetic dipole (M1), electric quadrupole (E2), and magnetic quadrupole (M2) transitions from the ground level to all 97 levels, although calculations are performed for a much larger number of levels. To achieve the accuracy of the data, comparisons are provided with similar data obtained from the Flexible Atomic Code (FAC) and also with the available theoretical and experimental results. Our energy levels are found to be accurate to better than 1.2%. Wavelengths calculated are found to lie in EUV (extreme ultraviolet) and x-ray regions. Additionally, lifetimes for all 97 levels are obtained for the first time. The authors, Indu Khatri and Arun Goyal, were supported by the U. G. C., India for their Junior Research Fellowship and Man Mohan by the U.G.C. for Basic Science Research Fellowship.

  9. CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

    NASA Astrophysics Data System (ADS)

    Nowak, K. M.; Ohta, T.; Suganuma, T.; Fujimoto, J.; Mizoguchi, H.; Sumitani, A.; Endo, A.

    2013-12-01

    It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.

  10. The effects of the prepulse on capillary discharge extreme ultraviolet laser

    SciTech Connect

    Shuker, M.; Ben-kish, A.; Nemirovsky, R.A.; Fisher, A.; Ron, A.

    2006-01-15

    In the past few years collisionally pumped extreme ultraviolet (XUV) lasers utilizing a capillary discharge were demonstrated. An intense current pulse is applied to a gas-filled capillary, inducing magnetic collapse (Z pinch) and formation of a highly ionized plasma column. Usually, a small current pulse (prepulse) is applied to the gas in order to preionize it prior to the onset of the main current pulse. In this paper we investigate the effects of the prepulse on a capillary discharge Ne-like Ar XUV laser (46.9 nm). The importance of the prepulse in achieving suitable initial conditions of the gas column and preventing instabilities during the collapse is demonstrated. Furthermore, measurements of the amplified spontaneous emission (ASE) properties (intensity and duration) in different prepulse currents revealed unexpected sensitivity. Increasing the prepulse current by a factor of 2 caused the ASE intensity to decrease by an order of magnitude and to nearly disappear. This effect is accompanied by a slight increase in the lasing duration. We attribute this effect to axial flow in the gas during the prepulse.

  11. Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

    SciTech Connect

    Shahzad, M.; Culfa, O.; Rossall, A. K.; Tallents, G. J.; Wilson, L. A.; Guilbaud, O.; Kazamias, S.; Delmas, O.; Demailly, J.; Maitrallain, A.; Pittman, M.; Baynard, E.; Farjardo, M.

    2015-02-15

    We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

  12. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption

    PubMed Central

    Sun, J. Q.; Cheng, X.; Ding, M. D.; Guo, Y.; Priest, E. R.; Parnell, C. E.; Edwards, S. J.; Zhang, J.; Chen, P. F.; Fang, C.

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin. PMID:26113464

  13. An extreme ultraviolet spectrometer experiment for the Shuttle Get Away Special Program

    NASA Technical Reports Server (NTRS)

    Conway, R. R.; Mccoy, R. P.; Meier, R. R.; Mount, G. H.; Prinz, D. K.; Young, J. M.; Carruthers, G. R.

    1984-01-01

    An extreme ultraviolet (EUV) spectrometer experiment operated successfully during the STS-7 mission in an experiment to measure the global and diurnal variation of the EUV airglow. The spectrometer is an F 3.5 Wadsworth mount with mechanical collimator, a 75 x 75 mm grating, and a bare microchannel plate detector providing a spectral resolution of 7 X FWHM. Read-out of the signal is through discrete channels or resistive anode techniques. The experiment includes a microcomputer, 20 Mbit tape recorder, and a 28V, 40 Ahr silver-zinc battery. It is the first GAS payload to use an opening door. The spectrometer's 0.1 x 4.2 deg field of view is pointed vertically out of the shuttle bay. During the STS-7 flight data were acquired continuously for a period of 5 hours and 37 minutes, providing spectra of the 570 A to 850 A wavelength region of the airglow. Five diurnal cycles of the 584 A emission of neutral helium and the 834 A emission of ionized atomic oxygen were recorded. The experiment also recorded ion events and pressure pulses associated with thruster firings. The experiment is to fly again on Mission 41-F.

  14. Temperature and Extreme-ultraviolet Intensity in a Coronal Prominence Cavity and Streamer

    NASA Astrophysics Data System (ADS)

    Kucera, T. A.; Gibson, S. E.; Schmit, D. J.; Landi, E.; Tripathi, D.

    2012-09-01

    We analyze the temperature and EUV line emission of a coronal cavity and surrounding streamer in terms of a morphological forward model. We use a series of iron line ratios observed with the Hinode Extreme-ultraviolet Imaging Spectrograph (EIS) on 2007 August 9 to constrain temperature as a function of altitude in a morphological forward model of the streamer and cavity. We also compare model predictions to the EIS EUV line intensities and polarized brightness (pB) data from the Mauna Loa Solar Observatory (MLSO) Mark 4 K-coronameter. This work builds on earlier analysis using the same model to determine geometry of and density in the same cavity and streamer. The fit to the data with altitude-dependent temperature profiles indicates that both the streamer and cavity have temperatures in the range 1.4-1.7 MK. However, the cavity exhibits substantial substructure such that the altitude-dependent temperature profile is not sufficient to completely model conditions in the cavity. Coronal prominence cavities are structured by magnetism so clues to this structure are to be found in their plasma properties. These temperature substructures are likely related to structures in the cavity magnetic field. Furthermore, we find that the model overestimates the EUV line intensities by a factor of 4-10, without overestimating pB. We discuss this difference in terms of filling factors and uncertainties in density diagnostics and elemental abundances.

  15. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    SciTech Connect

    Tanaka, Nozomi Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki; Sunahara, Atsushi

    2015-09-14

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9–25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ∼10{sup 9 }W/cm{sup 2}. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  16. The High-Resolution Extreme-Ultraviolet Spectrum of N_2 by Electron Impact

    NASA Astrophysics Data System (ADS)

    Heays, Alan; Ajello, Joe M.; Aguilar, Alejandro; Lewis, Brenton R.; Gibson, Stephen

    2014-06-01

    We have recorded high-resolution (FWHM = 0.2 Å) extreme-ultraviolet (EUV, 800--1350 Å) laboratory emission spectra of molecular nitrogen excited by 20 and 100 eV electron impact under mostly optically thin conditions. From these, emission cross sections were determined for a total of 491 features arising from N_2 electronic-vibrational transitions and atomic N I and N II multiplets. Molecular emission was observed from those excited levels which are not completely predissociative and to ground-state vibrational levels as high as v=17. The frequently-blended molecular emission bands were disentangled with the aid of a coupled-channels model of excited N_2 states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. The observed emission bands probe a large range of vibrational motion so that internuclear-distance-dependent electronic transition moments could be deduced experimental. The coupled-channels model could then be used to predict the emission cross sections of unobserved bands and those that are optically thick in the experimental spectra. The electron-impact-induced fluorescence measurements and model were compared with Cassini UVIS observations of emissions from Titan's upper atmosphere.

  17. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

    SciTech Connect

    WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K.; KINCY,MARK A.; TICHENOR,DANIEL A.; WILLIAMS,MARK E.; BISCHOFF,PAUL

    2000-01-27

    This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

  18. Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

    NASA Astrophysics Data System (ADS)

    Iguchi, Haruki; Hashimoto, Hiraku; Kuki, Masaki; Harada, Tetsuo; Kinoshita, Hiroo; Watanabe, Takeo; Platonov, Yuriy Y.; Kriese, Michael D.; Rodriguez, Jim R.

    2016-06-01

    In extreme-ultraviolet (EUV) lithography, the development of high-power EUV sources is one of the critical issues. The EUV output power directly depends on the collector mirror performance. Furthermore, mirrors with large diameters are necessary to achieve high collecting performance and take sufficient distance to prevent heat and debris from a radiation point of the source. Thus collector mirror development with accurate reflectometer is important. We have developed a large reflectometer at BL-10 beamline of the NewSUBARU synchrotron facility that can be used for mirrors with diameters, thicknesses, and weights of up to 800 mm, 250 mm, and 50 kg, respectively. This reflectometer can measure reflectivity with fully s-polarized EUV light. In this study, we measured the reflectance of a 412-mm-diameter EUV collector mirror using a maximum incident angle of 36°. We obtained the peak reflectance, center wavelength and reflection bandwidth results and compared our results with Physikalisch-Technische Bundesanstalt results.

  19. Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma.

    PubMed

    Bergmann, K; Schriever, G; Rosier, O; Müller, M; Neff, W; Lebert, R

    1999-09-01

    An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode geometry, which allows for omitting a switch between the storage capacity and the electrode system and for low inductive coupling of the electrically stored energy to the plasma. Thus energies of only a few joules are sufficient to create current pulses in the range of several kiloamperes, which lead to a compression and a heating of the plasmas to electron densities of more than 10(17) cm(-3) and temperatures of several tens of electron volts, which is necessary for emission in the EUV range. As an example, the emission spectrum of an oxygen plasma in the 11-18-nm range is presented. Transitions of beryllium- and lithium-like oxygen ions can be identified. Current waveform and time-resolved measurements of the EUV emission are discussed. In initial experiments a repetitive operation at nearly 0.2 kHz could be demonstrated. Additionally, the broadband emission of a xenon plasma generated in a 2.2-J discharge is presented.

  20. Relationship between extreme ultraviolet microflares and small-scale magnetic fields in the quiet Sun

    NASA Astrophysics Data System (ADS)

    Jiang, Fayu; Zhang, Jun; Yang, Shuhong

    2016-04-01

    Microflares are small dynamic signatures observed in X-ray and extreme-ultraviolet channels. Because of their impulsive emission enhancements and wide distribution, they are thought to be closely related to coronal heating. By using the high resolution 171 Å images from the Atmospheric Imaging Assembly and the lines-of-sight magnetograms obtained by the Helioseismic and Magnetic Imager on board the Solar Dynamics Observatory, we trace 10794 microflares in a quiet region near the disk center with a field of view of 960''× 1068'' during 24 hr. The microflares have an occurrence rate of 4.4 × 103 hr-1 extrapolated over the whole Sun. Their average brightness, size, and lifetime are 1.7 I0 (of the quiet Sun), 9.6 Mm2, and 3.6 min, respectively. There exists a mutual positive correlation between the microflares' brightness, area and lifetime. In general, the microflares distribute uniformly across the solar disk, but form network patterns locally, which are similar to and matched with the magnetic network structures. Typical cases show that the microflares prefer to occur in magnetic cancellation regions of network boundaries. We roughly calculate the upper limit of energy flux supplied by the microflares and find that the result is still a factor of ˜15 below the coronal heating requirement.

  1. Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

    SciTech Connect

    Spector, S. J.; White, D. L.; Tennant, D. M.; Ocola, L. E.; Novembre, A. E.; Peabody, M. L.; Wood, O. R. II

    1999-11-01

    We have developed two new methods for at-wavelength inspection of mask blanks for extreme-ultraviolet (EUV) lithography. In one method an EUV photoresist is applied directly to a mask blank which is then flood exposed with EUV light and partially developed. In the second method, the photoresist is applied to an EUV transparent membrane that is placed in close proximity to the mask and then exposed and developed. Both reflectivity defects and phase defects alter the exposure of the resist, resulting in mounds of resist at defect sites that can then be located by visual inspection. In the direct application method, a higher contrast resist was shown to increase the height of the mounds, thereby improving the sensitivity of the technique. In the membrane method, a holographic technique was used to reconstruct an image of the mask, revealing the presence of very small defects, approximately 0.2 {mu}m in size. The demonstrated clean transfer of phase and amplitude defects to resist features on a membrane will be important when flagging defects in an automatic inspection tool. (c) 1999 American Vacuum Society.

  2. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption.

    PubMed

    Sun, J Q; Cheng, X; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin. PMID:26113464

  3. DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

    NASA Astrophysics Data System (ADS)

    Yakshinskiy, B. V.; Wasielewski, R.; Loginova, E.; Hedhili, M. N.; Madey , T. E.

    2008-10-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H 2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ˜6 × 10 -19 cm 2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ˜0.02 electrons/photon at 92 eV.

  4. Silicon photodiodes with integrated thin-film filters for selective bandpasses in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Canfield, L. R.; Vest, Robert E.; Woods, Thomas N.; Korde, Raj S.

    1994-09-01

    Silicon photodiodes which operate satisfactorily in the extreme ultraviolet (EUV) have been commercially available for the past few years. These photodiodes also inherently respond to radiation extending from the x-ray region to the near infrared, a property which is undesirable in many EUV applications. The addition of a thin film of a suitable filtering material to the surface of such a photodiode can accomplish the restriction of the sensitivity of the silicon to a much narrower band, or bands, in the EUV. This results in a rugged, yet sensitive photometer for applications in which dominant out-of-band radiation is present. Applications include plasma diagnostics, solar physics, x-ray lithography, x-ray microscopy, and materials science. Previous attempts to produce such devices have resulted in degraded shunt resistance with a corresponding increase in background noise. Prototype detectors have now been fabricated using directly deposited films of aluminum, aluminum/carbon, aluminum/carbon/scandium, silver, tin, and titanium, without degradation of the noise characteristics of the uncoated photodiodes. Measured and theoretical sensitivity data are presented, as well as a discussion of relatively simple methods to reduce the x-ray response of such filtered detectors.

  5. Simulation of particle velocity in a laser-produced tin plasma extreme ultraviolet source

    SciTech Connect

    Masnavi, Majid; Nakajima, Mitsuo; Horioka, Kazuhiko; Araghy, Homaira Parchamy; Endo, Akira

    2011-06-15

    In connection with fast heating in a laser produced plasma (LPP) extreme ultraviolet (EUV) source, the superheating behavior of bulk tin (Sn) at high heating rates is investigated. A constant temperature and pressure molecular dynamics simulation using modified Lennard-Jones and Coulomb potentials suitable for studying the liquid structure of Sn is employed in order to derive the caloric curves of the solid and liquid phases. The results have shown transient effects on the phase transitions. Superheating is observed during the melting and vaporizing processes. The velocity distribution of Sn particles against typical laser fluence in a LPP EUV light source has been numerically investigated using a simplified method including a one-dimensional, two-temperature, molecular dynamics, and steady-state ionization model. In the framework of our model, it was found that ejected Sn particles have a maximum velocity on the order of 10 to 40 km/s in plasma created using a nanosecond pre-pulse neodymium-doped yttrium aluminum garnet (Nd:YAG, 1.06 {mu}m) laser in EUV lithography experiments.

  6. The Application of High-Order Harmonics to Extreme Ultraviolet Polarimetry

    NASA Astrophysics Data System (ADS)

    Brimhall, Nicole; Painter, John; Turner, Matthew; Turley, R. Steven; Ware, Michael; Peatross, Justin

    2006-10-01

    We report on the construction of an extreme ultraviolet (EUV) polarimeter based on high-order harmonic generation for characterizing optical surfaces from 8-62 nm. High harmonics as an EUV source are advantageous in that they are polarized (linear, same as laser) and measurements of several wavelengths of light can be made simultaneously. Although not as bright as a synchrotron source, the flux of EUV light is 30,000 times that of a commonly used plasma source. We have demonstrated the feasibility of this project with a simple prototype instrument, which measured the reflectance of samples from 30 nm to 62 nm. The prototype demonstrated that sensitivity is sufficient for measuring reflectances as low as 0.5%. The full instrument employs extensive scanning mobility as opposed to the fixed angle and fixed wavelength range of our earlier prototype. This project represents an authentic `work-horse' application for high-order harmonics, as opposed to merely demonstrating proof of concept.

  7. Medium-resolution studies of extreme-ultraviolet emission from CO by electron impact

    NASA Technical Reports Server (NTRS)

    Kanik, Isik; James, Geoffrey K.; Ajello, Joseph M.

    1995-01-01

    We report medium-resolution (0.025 nm full width at half maximum (FWHM)) electron impact-induced emission spectra of CO for 20, 100, and 200 eV impact energies. The emission spectra correspond to the extreme ultraviolet transitions from the B (sup 1)Sigma(sup +)(0), and E (sup 1)Pi(0) vibronic states to the X (sup 1)Sigma(sup +)(0) ground state. The present measurements are carried out at 20 times higher spectral resolution (to separate the many blended components) compared to our previous measurements, which were at a spectral resolution of 0.5 nm FWHM. The emission cross sections corresponding to the B (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0), C (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0), and E (sup 1)Pi(0) yields X (sup 1)Sigma(sup +)(0) resonance transitions were measured. In addition, excitation functions (0-1 keV) extending well into the Born region have been measured for the strong transitions (B (sup 1)Sigma(sup +)(0) yields X (sup 1)Sigma(sup +)(0) and C (sup 1)Sigma(sup +)(0)) and oscillator strengths have been determined, using a modified Born approximation analytic fit to the measured excitation function.

  8. The composition and structure of white dwarf atmospheres revealed by extreme ultraviolet spectroscopy

    NASA Technical Reports Server (NTRS)

    Barstow, Martin A.; Hubeny, Ivan; Lanz, Thierry; Holberg, Jay B.; Sion, Edward M.

    1995-01-01

    The ROentgen SATellite (ROSAT) and Extreme UltraViolet Explorer (EUVE) all-sky surveys have resulted in an important change in our understanding of the general composition of hydrogen-rich DA white dwarf atmospheres, with the photospheric opacity dominated by heavy elements rather than helium in the hottest stars (T > 40, 000 K). Most stars cooler than 40,000 K have more or less pure H atmospheres. However, one question, which has not been resolved, concerned the specific nature of the heavy elements and the role of helium in the hottest white dwarfs. One view of white dwarf evolution requires that H-rich DA stars form by gravitational settling of He from either DAO or He-rich central stars of planetary nebulae. In this case, the youngest (hottest) DA white dwarfs may still contain visible traces of He. Spectroscopic observations now available with EUVE provide a crucial test of these ideas. Analysis of data from the EUVE Guest Observer programme and EUVE public archive allows quantitative consideration of the sources of EUV opacity and places limits on the abundance of He which may be present.

  9. Generation, temporal characterization and applications of femtosecond-/ attosecond extreme ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Thomann, Isabell

    The work of this thesis is arranged into three parts: (A) Generation and temporal characterization of extreme ultraviolet (EUV) attosecond pulses. In this work I present the generation and first temporal characterization of sub-optical cycle EUV radiation generated in a noble-gas filled hollow-core waveguide. Two regimes of EUV radiation were characterized, ranging from 200 attoseconds to ˜ 1 femtosecond in duration. The first regime that was characterized distinguishes itself from EUV radiation generated by other methods by its narrow (˜ 1 eV) spectral width, its simple energy tunability and its temporal confinement to ˜ 1 femtosecond. In the second regime, single isolated pulses of 200 attoseconds duration (and accordingly larger bandwidth) were generated. In both regimes dynamic phase-matching effects create an extremely short time window within which efficient nonlinear conversion is possible, while it is suppressed outside this window. Temporal characterization of the generated EUV pulses was approached by two-color pump-probe photoelectron spectroscopy. Therefore an efficient photoelectron spectrometer was set up, detecting electrons in a 2pi collection angle. For the interpretation of the experimental data, an analytical model as well as an iterative algorithm were developed, to allow extraction of complex EUV waveforms. The demonstrated radiation will allow for time-resolved studies of the fastest processes in molecules and condensed matter, while at the same time ensuring adequate energy resolution for addressing individual electronic states. (B) Application of a COLTRIMS reaction microscope in combination with femtosecond EUV pulses to questions in molecular physics. The combination of the sensitive detection capabilities of a COLTRIMS reaction microscope with the high time resolution of pump-probe experiments using femtosecond extreme-ultraviolet pulses makes it possible to answer very fundamental open questions in molecular physics such as the

  10. Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials.

    PubMed

    Larruquert, Juan I

    2002-02-01

    Sub-quarterwave multilayer coatings with more than two different materials are shown to provide a reflectance enhancement compared with the standard two-material multilayer coatings when reflectance is limited by material absorption. A remarkable reflectance enhancement is obtained when the materials in the multilayer are moderately absorbing. A simple rule based on the material optical constants is provided to select the most suitable materials for the multilayer and to arrange the materials in the correct sequence in order to obtain the highest possible reflectance. It is shown that sub-quarterwave multilayers generalize the concept of multilayers, of which the standard two-material multilayers are a particular case. Various examples illustrate the benefit of sub-quarter-wave multilayer coatings for highest reflectance in the extreme ultraviolet. Applications for sub-quarterwave multilayer coatings are envisaged for astronomy in the extreme ultraviolet (EUV) and soft x rays and also for future EUY lithography.

  11. Diffuse Extreme-Ultraviolet Emission from the Coma Cluster: Evidence for Rapidly Cooling Gases at Submegakelvin Temperatures

    PubMed

    Lieu; Mittaz; Bowyer; Breen; Lockman; Murphy; Hwang

    1996-11-22

    The central region of the Coma cluster of galaxies was observed in the energy band from 0.065 to 0.245 kiloelectron volts by the Deep Survey telescope aboard the Extreme Ultraviolet Explorer. A diffuse emission halo of angular diameter approximately 30 arc minutes was detected. The extreme-ultraviolet (EUV) emission level exceeds that expected from the x-ray temperature gas in Coma. This halo suggests the presence of two more phases in the emitting gas, one at a temperature of approximately 2 x 10(6) kelvin and the other at approximately 8 x 10(5) kelvin. The latter phase cools rapidly and, in steady state, would have produced cold matter with a mass of approximately 10(14) solar masses within the EUV halo. Although a similar EUV enhancement was discovered in the Virgo cluster, this detection in Coma applies to a noncooling flow system. PMID:8910264

  12. Diffuse Extreme-Ultraviolet Emission from the Coma Cluster: Evidence for Rapidly Cooling Gases at Submegakelvin Temperatures

    PubMed

    Lieu; Mittaz; Bowyer; Breen; Lockman; Murphy; Hwang

    1996-11-22

    The central region of the Coma cluster of galaxies was observed in the energy band from 0.065 to 0.245 kiloelectron volts by the Deep Survey telescope aboard the Extreme Ultraviolet Explorer. A diffuse emission halo of angular diameter approximately 30 arc minutes was detected. The extreme-ultraviolet (EUV) emission level exceeds that expected from the x-ray temperature gas in Coma. This halo suggests the presence of two more phases in the emitting gas, one at a temperature of approximately 2 x 10(6) kelvin and the other at approximately 8 x 10(5) kelvin. The latter phase cools rapidly and, in steady state, would have produced cold matter with a mass of approximately 10(14) solar masses within the EUV halo. Although a similar EUV enhancement was discovered in the Virgo cluster, this detection in Coma applies to a noncooling flow system.

  13. Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources

    SciTech Connect

    Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Endo, Akira

    2010-12-06

    We have investigated the dependence of the spectral behavior and conversion efficiencies of rare-earth plasma extreme ultraviolet sources with peak emission at 6.7 nm on laser wavelength and the initial target density. The maximum conversion efficiency was 1.3% at a laser intensity of 1.6x10{sup 12} W/cm{sup 2} at an operating wavelength of 1064 nm, when self-absorption was reduced by use of a low initial density target. Moreover, the lower-density results in a narrower spectrum and therefore improved spectral purity. It is shown to be important to use a low initial density target and/or to produce low electron density plasmas for efficient extreme ultraviolet sources when using high-Z targets.

  14. Note: Development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

    SciTech Connect

    Dinh, Thanh Hung Suzuki, Yuhei; Hara, Hiroyuki; Higashiguchi, Takeshi; Hirose, Ryoichi; Ohashi, Hayato; Li, Bowen; Dunne, Padraig; O’Sullivan, Gerry; Sunahara, Atsushi

    2014-11-15

    We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 μm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.

  15. Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

    NASA Astrophysics Data System (ADS)

    Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

    2012-09-01

    The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition

  16. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation.

    PubMed

    Plötzing, M; Adam, R; Weier, C; Plucinski, L; Eich, S; Emmerich, S; Rollinger, M; Aeschlimann, M; Mathias, S; Schneider, C M

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  17. Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching

    SciTech Connect

    Shin, H.; Srivastava, S. N.; Ruzic, D. N.

    2008-05-15

    Tin (Sn) has the advantage of delivering higher conversion efficiency compared to other fuel materials (e.g., Xe or Li) in an extreme ultraviolet (EUV) source, a necessary component for the leading next generation lithography. However, the use of a condensable fuel in a lithography system leads to some additional challenges for maintaining a satisfactory lifetime of the collector optics. A critical issue leading to decreased mirror lifetime is the buildup of debris on the surface of the primary mirror that comes from the use of Sn in either gas discharge produced plasma (GDPP) or laser produced plasma (LPP). This leads to a decreased reflectivity from the added material thickness and increased surface roughness that contributes to scattering. Inductively coupled plasma reactive ion etching with halide ions is one potential solution to this problem. This article presents results for etch rate and selectivity of Sn over SiO{sub 2} and Ru. The Sn etch rate in a chlorine plasma is found to be much higher (of the order of hundreds of nm/min) than the etch rate of other materials. A thermally evaporated Sn on Ru sample was prepared and cleaned using an inductively coupled plasma etching method. Cleaning was confirmed using several material characterization techniques. Furthermore, a collector mock-up shell was then constructed and etching was performed on Sn samples prepared in a Sn EUV source using an optimized etching recipe. The sample surface before and after cleaning was analyzed by atomic force microscopy, x-ray photoelectron spectroscopy, and Auger electron spectroscopy. The results show the dependence of etch rate on the location of Sn samples placed on the collector mock-up shell.

  18. THE FIRST STRAY LIGHT CORRECTED EXTREME-ULTRAVIOLET IMAGES OF SOLAR CORONAL HOLES

    SciTech Connect

    Shearer, Paul; Gilbert, Anna C.; Frazin, Richard A.; Hero III, Alfred O. E-mail: annacg@umich.edu E-mail: hero@umich.edu

    2012-04-10

    Coronal holes are the source regions of the fast solar wind, which fills most of the solar system volume near the cycle minimum. Removing stray light from extreme-ultraviolet (EUV) images of the Sun's corona is of high astrophysical importance, as it is required to make meaningful determinations of temperatures and densities of coronal holes. EUV images tend to be dominated by the component of the stray light due to the long-range scatter caused by the microroughness of telescope mirror surfaces, and this component has proven very difficult to measure in pre-flight characterization. In-flight characterization heretofore has proven elusive due to the fact that the detected image is simultaneously nonlinear in two unknown functions: the stray light pattern and the true image that would be seen by an ideal telescope. Using a constrained blind deconvolution technique that takes advantage of known zeros in the true image provided by a fortuitous lunar transit, we have removed the stray light from solar images seen by the EUVI instrument on STEREO-B in all four filter bands (171, 195, 284, and 304 A). Uncertainty measures of the stray light corrected images, which include the systematic error due to misestimation of the scatter, are provided. It is shown that in EUVI, stray light contributes up to 70% of the emission in coronal holes seen on the solar disk, which has dramatic consequences for diagnostics of temperature and density and therefore estimates of key plasma parameters such as the plasma {beta} and ion-electron collision rates.

  19. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-15

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO{sub 2} laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  20. Geocentric position preliminary detection from the extreme ultraviolet images of Chang'E-3

    NASA Astrophysics Data System (ADS)

    Zheng, Chen; Ping, Jinsong; Wang, Mingyuan; Li, Wenxiao

    2015-08-01

    An Extreme ultraviolet (EUV) Camera was installed onboard the Chinese lunar surface landing mission, the Chang'E-3 lander, as a useful method to observe the Earth plasmasphere. This EUV optical payload obtained more than 600 moon-based Earth plasmasphere images since December 14, 2013. However, due to errors of unknown size and origin in the platform attitude control of the lander and in the EUV telescope pointing control during the mission operating periods, the geocentric coordinates in these EUV images are not fixed in the same position of CCD pixel. Before adequately calibrating, these positioning offsets will introduce extra errors into the analysis of the plasmaspheric structure. With only a little insufficient telemetry information, an effective calibrating method of circle-based differential algorithm is suggested and demonstrated, for automatically and precisely detecting the geocentric position in each EUV image of Chang'E-3 mission. In each EUV image, the tested method uses the outline of a circle as the basic unit to capture the contour for the bright region based on the spectral characteristic. Then, the center of the extracted circle is adopted as the geocentric position for the image. The preliminary analysis shows that this method can effectively detect the geocentric position being always consistent with the recognition result by the basic hand labor method. It is found that the radius of the circles varies from month to month from December, 2013 to May, 2014. The monthly averages of radius show relative notable positive correlation and negative correlation with the changes of both Zenith angle of the Earth at the landing area of Chang'E-3 lander, and the Earth-moon distance, respectively. This method and results here will benefit the Chang'E-3 EUV study.

  1. Extreme-ultraviolet beam-foil spectroscopy of highly ionized neon and argon. Doctoral thesis

    SciTech Connect

    Demarest, J.A.

    1986-08-01

    A study of the extreme-ultraviolet radiation emitted by ion beams of highly ionized neon and argon after passage through thin foils was conducted. A grazing-incidence spectrometer was equipped with a position-sensitive microchannel plate (MCP) detector, which improved the detection efficiency by two orders of magnitude. The position information of the MCP was determined to be linear over 90% of the 50-mm-wide detector. Spectra spanning regions of over 100 A were accumulated at a resolution of less than 1 A. A wavelength calibration based on a second order equation of spectrometer position was found to result in an accuracy of - 0.1 A. Over 40 transitions of Ne VIII, Ne IX, and Ne X were observed in the wavelength region from 350 to 30 A from n=2-3,4,5; n=3-4,5,6,7,8; n=4-6,7; and n=5-9. An intensity calibration of the detection system allowed the determination of the relative populations of n=3 states of Ne VIII and Ne IX. An overpopulation of states with low orbital angular momenta support electron-capture predictions by the first-order Born approximation. The argon beam-foil data confirmed the wavelength predictions of 30 previously unobserved transitions in the wavlength region from 355 to 25 A from n=2-2; n=3-4; n=4-5,6,7; and n=6-8. Lifetime determinations were made by the simultaneous measurement of 26 argon lines in the spectral region from 295-180 A. Many of the n=2-2 transitions agreed well with theory.

  2. Overlying extreme-ultraviolet arcades preventing eruption of a filament observed by AIA/SDO

    SciTech Connect

    Chen, Huadong; Ma, Suli; Zhang, Jun

    2013-11-20

    Using the multi-wavelength data from the Atmospheric Imaging Assembly/Solar Dynamic Observatory (AIA/SDO) and the Sun Earth Connection Coronal and Heliospheric Investigation/Solar Terrestrial Relations Observatory (SECCHI/STEREO), we report a failed filament eruption in NOAA AR 11339 on 2011 November 3. The eruption was associated with an X1.9 flare, but without any coronal mass ejection (CME), coronal dimming, or extreme ultraviolet (EUV) waves. Some magnetic arcades above the filament were observed distinctly in EUV channels, especially in the AIA 94 Å and 131 Å wavebands, before and during the filament eruption process. Our results show that the overlying arcades expanded along with the ascent of the filament at first until they reached a projected height of about 49 Mm above the Sun's surface, where they stopped. The following filament material was observed to be confined by the stopped EUV arcades and not to escape from the Sun. After the flare, a new filament formed at the low corona where part of the former filament remained before its eruption. These results support that the overlying arcades play an important role in preventing the filament from successfully erupting outward. We also discuss in this paper the EUV emission of the overlying arcades during the flare. It is rare for a failed filament eruption to be associated with an X1.9 class flare, but not with a CME or EUV waves. Therefore, this study also provides valuable insight into the triggering mechanism of the initiation of CMEs and EUV waves.

  3. Nonthermal phase transitions in semiconductors induced by a femtosecond extreme ultraviolet laser pulse

    NASA Astrophysics Data System (ADS)

    Medvedev, Nikita; Jeschke, Harald O.; Ziaja, Beata

    2013-01-01

    In this paper, we present a novel theoretical approach, which allows the study of nonequilibrium dynamics of both electrons and atoms/ions within free-electron laser excited semiconductors at femtosecond time scales. The approach consists of the Monte-Carlo method treating photoabsorption, high-energy-electron and core-hole kinetics and relaxation processes. Low-energy electrons localized within the valence and conduction bands of the target are treated with a temperature equation, including source terms, defined by the exchange of energy and particles with high-energy electrons and atoms. We follow the atomic motion with the molecular dynamics method on the changing potential energy surface. The changes of the potential energy surface and of the electron band structure are calculated at each time step with the help of the tight-binding method. Such a combination of methods enables investigation of nonequilibrium structural changes within materials under extreme ultraviolet (XUV) femtosecond irradiation. Our analysis performed for diamond irradiated with an XUV femtosecond laser pulse predicts for the first time in this wavelength regime the nonthermal phase transition from diamond to graphite. Similar to the case of visible light irradiation, this transition takes place within a few tens of femtoseconds and is caused by changes of the interatomic potential induced by ultrafast electronic excitations. It thus occurs well before the heating stimulated by electron-phonon coupling starts to play a role. This allows us to conclude that this transition is nonthermal and represents a general mechanism of the response of solids to ultrafast electron excitations.

  4. A chain of winking (oscillating) filaments triggered by an invisible extreme-ultraviolet wave

    SciTech Connect

    Shen, Yuandeng; Tian, Zhanjun; Zhao, Ruijuan; Ichimoto, Kiyoshi; Ishii, Takako T.; Shibata, Kazunari

    2014-05-10

    Winking (oscillating) filaments have been observed for many years. However, observations of successive winking filaments in one event have not yet been reported. In this paper, we present the observations of a chain of winking filaments and a subsequent jet that are observed right after the X2.1 flare in AR11283. The event also produced an extreme-ultraviolet (EUV) wave that has two components: an upward dome-like wave (850 km s{sup –1}) and a lateral surface wave (554 km s{sup –1}) that was very weak (or invisible) in imaging observations. By analyzing the temporal and spatial relationships between the oscillating filaments and the EUV waves, we propose that all the winking filaments and the jet were triggered by the weak (or invisible) lateral surface EUV wave. The oscillation of the filaments last for two or three cycles, and their periods, Doppler velocity amplitudes, and damping times are 11-22 minutes, 6-14 km s{sup –1}, and 25-60 minutes, respectively. We further estimate the radial component magnetic field and the maximum kinetic energy of the filaments, and they are 5-10 G and ∼10{sup 19} J, respectively. The estimated maximum kinetic energy is comparable to the minimum energy of ordinary EUV waves, suggesting that EUV waves can efficiently launch filament oscillations on their path. Based on our analysis results, we conclude that the EUV wave is a good agent for triggering and connecting successive but separated solar activities in the solar atmosphere, and it is also important for producing solar sympathetic eruptions.

  5. High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography

    SciTech Connect

    Wedowski, M; Underwood, J H; Gullikson, E M; Bajt, S; Folta, J A; Kearney, P A; Montcalm, C; Spiller, E

    1999-12-29

    Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of the multilayer coatings. Therefore, multilayer deposition on near-normal incidence optical surfaces of projection optics, condenser optics and reflective masks requires suitable high-precision metrology. Most important, due to their small bandpass on the order of only 0.5 nm, all reflective multilayer coatings in EUVL systems must be wavelength-matched to within {+-}0.05 nm. In some cases, a gradient of the coating thickness is necessary for wavelength matching at variable average angle of incidence in different locations on the optical surfaces. Furthermore, in order to preserve the geometrical figure of the optical substrates, reflective multilayer coatings need to be uniform to within 0.01 nm in their center wavelength. This requirement can only be fulfilled with suitable metrology, which provides a precision of a fraction of this value. In addition, for the detailed understanding and the further development of reflective multilayer coatings a precision in the determination of peak reflectances is desirable on the order of 0.1%. Substrates up to 200 mm in diameter and 15 kg in mass need to be accommodated. Above requirements are fulfilled at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley. This beamline proved to be precise within 0.2% (ms) for reflectance and 0.002 nm (rms) for wavelength.

  6. A Comparative Study of the Mass Distribution of Extreme-Ultraviolet-selected White Dwarfs

    NASA Astrophysics Data System (ADS)

    Napiwotzki, R.; Green, Paul J.; Saffer, Rex A.

    1999-05-01

    We present new determinations of effective temperature, surface gravity, and masses for a sample of 46 hot DA white dwarfs selected from the Extreme Ultraviolet Explorer (EUVE) and ROSAT Wide Field Camera bright source lists in the course of a near-infrared survey for low-mass companions. Our analysis, based on hydrogen non-LTE model atmospheres, provides a map of LTE correction vectors, which allow a thorough comparison with previous LTE studies. We find that previous studies underestimate both the systematic errors and the observational scatter in the determination of white dwarf parameters obtained via fits to model atmospheres. The structure of very hot or low-mass white dwarfs depends sensitively on their history. To compute white dwarf masses, we thus use theoretical mass-radius relations that take into account the complete evolution from the main sequence. We find a peak mass of our white dwarf sample of 0.59 Msolar, in agreement with the results of previous analyses. However, we do not confirm a trend of peak mass with temperature reported in two previous analyses. Analogous to other EUV-selected samples, we note a lack of low-mass white dwarfs and a large fraction of massive white dwarfs. Only one white dwarf is likely to have a helium core. While the lack of helium white dwarfs in our sample can be easily understood from their high cooling rate, and therefore low detection probability in our temperature range, this is not enough to explain the large fraction of massive white dwarfs. This feature very likely results from a decreased relative sample volume for low-mass white dwarfs caused by interstellar absorption in EUV-selected samples. Spectral observations reported here were obtained with the Multiple Mirror Telescope, a joint facility of the University of Arizona and the Smithsonian Institution, and with the Bok telescope at the Steward Observatory of the University of Arizona.

  7. ACTIVE REGION MOSS: DOPPLER SHIFTS FROM HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER OBSERVATIONS

    SciTech Connect

    Tripathi, Durgesh; Mason, Helen E.; Klimchuk, James A.

    2012-07-01

    Studying the Doppler shifts and the temperature dependence of Doppler shifts in moss regions can help us understand the heating processes in the core of the active regions. In this paper, we have used an active region observation recorded by the Extreme-ultraviolet Imaging Spectrometer (EIS) on board Hinode on 2007 December 12 to measure the Doppler shifts in the moss regions. We have distinguished the moss regions from the rest of the active region by defining a low-density cutoff as derived by Tripathi et al. in 2010. We have carried out a very careful analysis of the EIS wavelength calibration based on the method described by Young et al. in 2012. For spectral lines having maximum sensitivity between log T = 5.85 and log T = 6.25 K, we find that the velocity distribution peaks at around 0 km s{sup -1} with an estimated error of 4-5 km s{sup -1}. The width of the distribution decreases with temperature. The mean of the distribution shows a blueshift which increases with increasing temperature and the distribution also shows asymmetries toward blueshift. Comparing these results with observables predicted from different coronal heating models, we find that these results are consistent with both steady and impulsive heating scenarios. However, the fact that there are a significant number of pixels showing velocity amplitudes that exceed the uncertainty of 5 km s{sup -1} is suggestive of impulsive heating. Clearly, further observational constraints are needed to distinguish between these two heating scenarios.

  8. Observation of a Quasiperiodic Pulsation in Hard X-Ray, Radio, and Extreme-ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk

    2016-05-01

    We present a multiwavelength analysis of a quasiperiodic pulsation (QPP) observed in the hard X-ray (HXR), radio, and extreme-ultraviolet (EUV) channels during an M1.9 flare that occurred on 2011 September 23-24. The nonthermal HXR emission in 25-50 keV observed by RHESSI shows five distinct impulsive peaks of decaying amplitude with a period of about 3 minutes. A similar QPP was observed in the microwave emission recorded by the Nobeyama Radioheliograph and Polarimeter in the 2, 3.75, 9.4, and 17 GHz channels. Interestingly, the 3-minute QPP was also observed in the metric and decimetric radio frequencies (25-180, 245, 610 MHz) as repetitive type III bursts. Multiwavelength observations from the Solar Dynamics Observatory/Atmospheric Image Assembly, Hinode/SOT, and Solar TErrestrial RElations Observatory/SECCHI suggest a fan-spine topology at the eruption site, associated with the formation of a quasi-circular ribbon during the flare. A small filament was observed below the fan loops before the flare onset. The filament rose slowly and interacted with the ambient field. This behavior was followed by an untwisting motion of the filament. Two different structures of the filament showed an approximately 3-minute periodic alternate rotation in the clockwise and counterclockwise directions. The 3-minute QPP was found to highly correlate with 3-minute oscillations in a nearby sunspot. We suggest that the periodic reconnection (modulated either by a sunspot slow-mode wave or by an untwisting filament) at a magnetic null point most likely causes the repetitive particle acceleration, generating the QPP observed in HXR, microwave, and type III radio bursts.

  9. On the nature of the extreme-ultraviolet late phase of solar flares

    SciTech Connect

    Li, Y.; Ding, M. D.; Guo, Y.; Dai, Y.

    2014-10-01

    The extreme-ultraviolet (EUV) late phase of solar flares is a second peak of warm coronal emissions (e.g., Fe XVI) for many minutes to a few hours after the GOES soft X-ray peak. It was first observed by the EUV Variability Experiment on board the Solar Dynamics Observatory (SDO). The late-phase emission originates from a second set of longer loops (late-phase loops) that are higher than the main flaring loops. It is suggested to be caused by either additional heating or long-lasting cooling. In this paper, we study the role of long-lasting cooling and additional heating in producing the EUV late phase using the enthalpy based thermal evolution of loops model. We find that a long cooling process in late-phase loops can well explain the presence of the EUV late-phase emission, but we cannot exclude the possibility of additional heating in the decay phase. Moreover, we provide two preliminary methods based on the UV and EUV emissions from the Atmospheric Imaging Assembly on board SDO to determine whether or not additional heating plays a role in the late-phase emission. Using nonlinear force-free field modeling, we study the magnetic configuration of the EUV late phase. It is found that the late phase can be generated either in hot spine field lines associated with a magnetic null point or in large-scale magnetic loops of multipolar magnetic fields. In this paper, we also discuss why the EUV late phase is usually observed in warm coronal emissions and why the majority of flares do not exhibit an EUV late phase.

  10. Construction of an extreme ultraviolet polarimeter based on high-order harmonic generation

    NASA Astrophysics Data System (ADS)

    Brimhall, N.; Painter, J. C.; Turner, M.; Voronov, S. V.; Turley, R. S.; Ware, M.; Peatross, J.

    2006-08-01

    We report on the development of a polarimeter for characterizing reflective surfaces throughout the extreme ultraviolet (EUV). The instrument relies on laser high-order harmonics generated in helium, neon, or argon gas. The 800 nm laser generates a discrete comb of odd harmonics up to order 100 (wavelengths from 8-62 nm). The flux of EUV light is a couple orders of magnitude less than a synchrotron source but 30,000 times greater than a plasma source currently in operation at BYU. The polarimeter determines the reflectance from surfaces as a function of incident angle, linear light polarization orientation, and wavelength. The instrument uses a wave plate in the laser beam to control the orientation of the harmonic polarization (linear, same as laser). After reflecting from the sample, the harmonic beams are dispersed by a grating and focused onto a micro-channel plate coupled to a phosphor screen. We have demonstrated the feasibility of this project with a simple prototype instrument, which measured the reflectance of samples from 30 nm to 62 nm. The prototype demonstrated that sensitivity is sufficient for measuring reflectances as low as 0.5% for both s- and p-polarized light. The full instrument employs extensive scanning mobility as opposed to the fixed angle and fixed wavelength range of our earlier prototype. An advantage of employing harmonics as a source for EUV polarimetry is that a wide range of wavelengths can be measured simultaneously. This project represents an authentic 'work-horse' application for high-order harmonics, as opposed to merely demonstrating proof of concept.

  11. Observation of a Quasiperiodic Pulsation in Hard X-Ray, Radio, and Extreme-ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk

    2016-05-01

    We present a multiwavelength analysis of a quasiperiodic pulsation (QPP) observed in the hard X-ray (HXR), radio, and extreme-ultraviolet (EUV) channels during an M1.9 flare that occurred on 2011 September 23–24. The nonthermal HXR emission in 25–50 keV observed by RHESSI shows five distinct impulsive peaks of decaying amplitude with a period of about 3 minutes. A similar QPP was observed in the microwave emission recorded by the Nobeyama Radioheliograph and Polarimeter in the 2, 3.75, 9.4, and 17 GHz channels. Interestingly, the 3-minute QPP was also observed in the metric and decimetric radio frequencies (25–180, 245, 610 MHz) as repetitive type III bursts. Multiwavelength observations from the Solar Dynamics Observatory/Atmospheric Image Assembly, Hinode/SOT, and Solar TErrestrial RElations Observatory/SECCHI suggest a fan-spine topology at the eruption site, associated with the formation of a quasi-circular ribbon during the flare. A small filament was observed below the fan loops before the flare onset. The filament rose slowly and interacted with the ambient field. This behavior was followed by an untwisting motion of the filament. Two different structures of the filament showed an approximately 3-minute periodic alternate rotation in the clockwise and counterclockwise directions. The 3-minute QPP was found to highly correlate with 3-minute oscillations in a nearby sunspot. We suggest that the periodic reconnection (modulated either by a sunspot slow-mode wave or by an untwisting filament) at a magnetic null point most likely causes the repetitive particle acceleration, generating the QPP observed in HXR, microwave, and type III radio bursts.

  12. The extreme ultraviolet spectra of low-redshift radio-loud quasars

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Reynolds, Cormac; Marziani, Paola; O'Dea, Christopher P.

    2016-07-01

    This paper reports on the extreme ultraviolet (EUV) spectrum of three low-redshift (z ˜ 0.6) radio-loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph of the Hubble Space Telescope. The bolometric thermal emission, Lbol, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long-term time-averaged jet power, overline{Q}, for the three sources. overline{Q}/L_{bol}, is shown to lie along the correlation of overline{Q}/L_{bol}, and αEUV found in previous studies of the EUV continuum of intermediate and high-redshift quasars, where the EUV continuum flux density between 1100 and 700 Å is defined by F_{ν } ˜ ν ^{-α _{EUV}}. The high Eddington ratios of the three quasars extend the analysis into a wider parameter space. Selecting quasars with high Eddington ratios has accentuated the statistical significance of the partial correlation analysis of the data. Namely, the correlation of overline{Q}/L_{bol} and αEUV is fundamental, and the correlation of overline{Q} and αEUV is spurious at a very high statistical significance level (99.8 per cent). This supports the regulating role of ram pressure of the accretion flow in magnetically arrested accretion models of jet production. In the process of this study, we use multifrequency and multiresolution Very Large Array radio observations to determine that one of the bipolar jets in 3C 57 is likely frustrated by galactic gas that keeps the jet from propagating outside the host galaxy.

  13. Analysis of the operation and plasma dynamics of extreme- ultraviolet and soft x-ray lasers

    NASA Astrophysics Data System (ADS)

    Bender, Howard Albert, III

    Extending lasing action into the extreme ultraviolet and soft x-ray regions of the electromagnetic spectrum has been a natural progression in the continuing development of short wavelength radiation sources. However fundamental difficulties with the media used to produce short wavelength lasers has in general hindered the widespread development and use of such lasers in applications. Up to now all EUV and soft x-ray lasers have operated with plasmas as the gain medium to support lasing. This is a general requirement imposed by (1) the characteristics of short wavelength radiation as it originates from highly energetic atomic transitions and (2) the fundamental aspects of lasing at these wavelengths. Thus the plasma environment has been the defining characteristic in achieving lasing in the EUV and soft x-ray spectral regions. This thesis presents investigations into two types of EUV/Soft x-ray lasers that describe the operation and associated plasma dynamics of these devices. The first is a numerical investigation into a recombination pumped x-ray laser at 13.5 nm operating in a Li plasma. Using a collisional-radiative model of the atomic system, simulations were performed to determine the plasma conditions necessary to produce gain that were observed in reported experiments. The second investigation is the experimental development and operation of a capillary discharge driven laser operating at 46.9 nm in Ar. This device is a new generation of EUV/Soft X-ray laser based on a small scale driver system. The first interferometric probing experiments of this device will be discussed and related to the plasma dynamics of the capillary discharge.

  14. Effects of an extreme desert dust event on the spectral ultraviolet irradiance at El Arenosillo (Spain)

    NASA Astrophysics Data System (ADS)

    Antón, M.; Sorribas, M.; Bennouna, Y.; Vilaplana, J. M.; Cachorro, V. E.; GröBner, J.; Alados-Arboledas, L.

    2012-02-01

    This paper analyzes the effects of an extreme Saharan dust event detected on 6 September 2007 on spectral UV irradiance recorded at El Arenosillo, South Spain. The intensity of the extreme event was detected using the aerosol optical depth (AOD) and Angström exponent series obtained by a Cimel Sun photometer operated at the study site in the framework of the Aerosol Robotic Network (AERONET). This Saharan dust event is characterized by its strong intensity, with a mean daily AOD value at 440 nm of 1.35 ± 0.40 (1.76 ± 0.03 around 13:00 UT). Additionally, a moderate decrease (˜15 Dobson units (1 DU = 2.69 × 1016 molecules cm-2)) in the total ozone column was recorded with a Brewer spectrophotometer during this episode. The spectral UV irradiance was measured from the transportable Quality Assurance of Spectral Ultraviolet Measurements in Europe (QASUME) through the development of a transportable unit reference spectroradiometer. The relative decrease of the UV irradiance at 320 nm on 6 September is about 50% (40%) with respect to days with low (moderate) aerosol loads. This attenuation slightly decreases with increasing wavelength above 315 nm. The relative differences between QASUME measurements and the spectral UV irradiance derived from the Ozone Monitoring Instrument (OMI) were calculated for the desert dust episode. This satellite instrument strongly overestimates the ground-based UV data recorded on 6 September, with differences between 138% at 305 nm and 72% at 380 nm. Finally, the aerosol forcing efficiency (AFE) is evaluated for UV-B (290-315 nm), UV-A (315-400 nm), and erythemal UV (290-400 nm, weighted by the CIE spectrum), showing a notable decrease (in absolute value) with increasing solar zenith angles (SZAs). For instance, the AFE values for the harmful UV-B irradiance change from -0.41 W/m2 per unit of AOD at 440 nm for a SZA of 30° to -0.21 W/m2 per unit of AOD for a SZA of 50°.

  15. Modelling Turbine Loads during an Extreme Coherent Gust using Large Eddy Simulation

    NASA Astrophysics Data System (ADS)

    Storey, R. C.; Norris, S. E.; Cater, J. E.

    2014-06-01

    A group of wind turbines operating in extreme transient wind conditions has been simulated using LES and an actuator model. An extreme wind event is introduced into the simulation domain using transient boundary conditions. The event is based on the extreme coherent gust (ECG) structure from the International Wind Turbine Design Standard IEC61400-1:2005 which consists of a simultaneous gust and wind direction change. Details of the implementation are discussed with regard to adapting the analytical functions described in the standard. A recently developed actuator sector method is used to represent the wind turbines in the simulation. The actuator method is coupled to the aero-elastic wind turbine simulation code FAST to allow dynamic control of the wind turbines based on the ambient flow conditions. Standard baseline controllers are used to regulate generator torque, actuate blade pitch angle and control yaw direction. A span-wise periodic array of turbines operating in a steady atmospheric boundary layer is simulated before the introduction of the ECG structure. The convection of the wind event is analysed, along with the subsequent response of the wind turbines and loading during the wind event is quantified. The simulations demonstrate a methodology for modelling groups of turbines operating in transient wind conditions that can be used to study turbine loads or test new turbine control strategies.

  16. High resolution coherent diffractive imaging with a table-top extreme ultraviolet source

    SciTech Connect

    Vu Le, Hoang Ba Dinh, Khuong; Hannaford, Peter; Van Dao, Lap

    2014-11-07

    We demonstrate a resolution of 45 nm with a sample size down to 3 μm × 3 μm is achieved in a short exposure time of 2 s, from the diffraction pattern generated by a table-top high harmonic source at around 30 nm. By using a narrow-bandwidth focusing mirror, the diffraction pattern's quality is improved and the required exposure time is significantly reduced. In order to obtain a high quality of the reconstructed image, the ratio of the beam size to the sample size and the curvature of the focused beam need to be considered in the reconstruction process. This new experimental scheme is very promising for imaging sub-10 nm scale objects with a table-top source based on a small inexpensive femtosecond laser system.

  17. Method and apparatus for generating coherent radiation in the ultra-violet region and above by use of distributed feedback

    NASA Technical Reports Server (NTRS)

    Saffren, M. M. (Inventor)

    1976-01-01

    Helium in the superfluid state emits copious amounts of radiation in the ultraviolet region when excited by an electron stream. Conventional laser action using mirrors is impossible in superfluid helium because there are no mirrors that will reflect VUV radiation. By utilizing the distributed feedback method, the superfluid helium can be made to lase. By setting up a standing wave in superfluid helium that has a wavelength equal to, or harmonically related to, half the wavelength of the photon radiation chosen to be emitted as laser radiation by the superfluid helium, the need for end mirrors to produce reflection of the laser radiation is eliminated and reflection occurs instead at the wavefronts of the standing wave. The photons leave the superfluid helium at right angles to the standing wave as coherent radiation having a very high intensity. The standing wave established in the superfluid helium may be an acoustical standing wave, a thermal standing wave (second sound), or an electric standing wave.

  18. Extreme ultraviolet lithography and three dimensional integrated circuit—A review

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay

    2014-03-01

    Extreme ultraviolet lithography (EUVL) and three dimensional integrated circuit (3D IC) were thoroughly reviewed. Since proposed in 1988, EUVL obtained intensive studies globally and, after 2000, became the most promising next generation lithography method even though challenges were present in almost all aspects of EUVL technology. Commercial step-and-scan tools for preproduction are installed now with full field capability; however, EUV source power at intermediate focus (IF) has not yet met volume manufacturing requirements. Compared with the target of 200 W in-band power at IF, current tools can supply only approximately 40-55 W. EUVL resist has improved significantly in the last few years, with 13 nm line/space half-pitch resolution being produced with approximately 3-4 nm line width roughness (LWR), but LWR needs 2× improvement. Creating a defect-free EUVL mask is currently an obstacle. Actual adoption of EUVL for 22 nm and beyond technology nodes will depend on the extension of current optical lithography (193 nm immersion lithography, combined with multiple patterning techniques), as well as other methods such as 3D IC. Lithography has been the enabler for IC performance improvement by increasing device density, clock rate, and transistor rate. However, after the turn of the century, IC scaling resulted in short-channel effect, which decreases power efficiency dramatically, so clock frequency almost stopped increasing. Although further IC scaling by lithography reduces gate delay, interconnect delay and memory wall are dominant in determining the IC performance. 3D IC technology is a critical technology today because it offers a reasonable route to further improve IC performance. It increases device density, reduces the interconnect delay, and breaks memory wall with the application of 3D stacking using through silicon via. 3D IC also makes one chip package have more functional diversification than those enhanced only by shrinking the size of the features

  19. Multilayer Optics for an Extreme Ultraviolet Lithography Tool with 70 nm Resolution

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Davidson, J C; Brabner, R F; Bullikson, E M; Kaufmann, B B; Baker, S L; Chapman, H N; Hudyma, R M; Taylor, J S; Walton, C C; Montcalm, C; Folta, J A

    2001-05-04

    One of the most critical tasks in the development of extreme ultraviolet lithography (EUVL) is the accurate deposition of reflective multilayer coatings for the mirrors comprising the EUVL tool. The second set (Set 2) of four imaging optics for an alpha-class EUVL system has been coated successfully. All four mirrors (M1, M2, M3, M4) were Mo/Si-coated during a single deposition run with a production-scale DC-magnetron sputtering system. Ideally, the multilayer coatings should not degrade the residual wavefront error of the imaging system design. For the present EUVL camera, this requirement is equivalent to depositing multilayer coatings that would add a figure error of less than 0.11 nm rms. In addition, all mirrors should be matched in centroid wavelength, in order to insure maximum throughput of the EUVL tool. In order to meet these constraints, the multilayer deposition process needs to be controlled to atomic precision. EUV measurements of the coated mirrors determined that the added figure errors due to the multilayer coatings are 0.032 nm rms (M1), 0.037 nm rms (M2), 0.040 nm rms (M3) and 0.015 nm rms (M4), well within the aforementioned requirement of 0.11 nm rms. The average wavelength among the four projection mirrors is 13.352 nm, with an optic-to-optic matching of 1{sigma}=0.010 nm. This outstanding level of wavelength matching produces 99.3% of the throughput of an ideally matched four-mirror system. Peak reflectances are 63.8% (M1), 65.2% (M2), 63.8% (M3) and 66.7% (M4). The variation in reflectance values between the four optics is consistent with their high frequency substrate roughness. It is predicted that the multilayer coatings will not introduce any aberrations in the lithographic system performance, for both static and scanned images of 70 nm-dense features.

  20. Thermally Averaged Collision Strengths for Extreme-ultraviolet Line of Fe IX

    NASA Astrophysics Data System (ADS)

    Tayal, S. S.; Zatsarinny, O.

    2015-10-01

    Collision strengths and thermally averaged collision strengths for a large number of extreme-ultraviolet lines of Fe ix arising by electron impact have been reported. The thermally averaged collision strengths are calculated at electron temperatures in the range 104-107 K for the 122,043 forbidden and allowed transitions between the 370 fine-structure levels. The atomic parameters for Fe ix play an important role in modeling of various astrophysical plasmas, including especially the solar corona. The B-spline Breit-Pauli R-matrix method has been used in the calculation of collision strengths. The target wave functions and transition probabilities have been determined by combining the multiconfiguration Hartree-Fock method with the B-spline box-based multichannel expansions. We have included 370 fine-structure levels of Fe ix in the energy region up to 3{s}23{p}55s states. The close-coupling expansion includes levels of the 3{s}23{p}6, 3{s}23{p}53d,4l,5s, 3s3{p}63d,4s,4p, 3{s}23{p}43{d}2, 3s3{p}53{d}2 configurations and some low-lying levels of the 3{s}23{p}33{d}3 configuration in our collision strengths and transition probabilities calculations. There is a good agreement with the previous R-matrix collision strength calculations by Storey et al. and Del Zanna et al. for transitions between the lowest 17 levels of the 3{s}23{p}6, 3{s}23{p}53d, and 3s3{p}63d configurations, especially for electron temperatures log T(K) ≥ 5.0. The transitions between the first 17 levels are dominated by Rydberg series of resonances converging to the levels of the 3{s}23{p}43{d}2 configuration. The present results and the calculation of Del Zanna et al. show significant differences for many weaker forbidden and intercombination transitions with thermally averaged collision strengths smaller than 0.01.

  1. Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2013-04-01

    As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of

  2. TWO TYPES OF EXTREME-ULTRAVIOLET BRIGHTENINGS IN AR 10926 OBSERVED BY HINODE/EIS

    SciTech Connect

    Lee, K.-S.; Moon, Y.-J.; Choe, G. S.; Kim, Sujin; Cho, Kyung-Suk; Imada, S.

    2011-07-20

    We have investigated seven extreme-ultraviolet (EUV) brightenings in the active region AR 10926 on 2006 December 2 observed by the EUV Imaging Spectrometer on board the Hinode spacecraft. We have determined their Doppler velocities and non-thermal velocities from 15 EUV spectral lines (log T = 4.7 - 6.4) by fitting each line profile to a Gaussian function. The Doppler velocity maps for different temperatures are presented to show the height dependence of the Doppler shifts. It is found that the active region brightenings show two distinct Doppler shift patterns. The type 1 brightening shows a systematic increase of Doppler velocity from -68 km s{sup -1} (strong blueshift) at log T = 4.7 to -2 km s{sup -1} (weak blueshift) at log T = 6.4, while the type 2 brightenings have Doppler velocities in the range from -20 km s{sup -1} to 20 km s{sup -1}. The type 1 brightening point is considered to sit in an upward reconnection outflow whose speed decreases with height. In both types of brightenings, the non-thermal velocity is found to be significantly enhanced at log T = 5.8 compared to the background region. We have also determined electron densities from line ratios and derived temperatures from emission measure loci using the CHIANTI atomic database. The electron densities of all brightenings are comparable to typical values in active regions (log N{sub e} = 9.9-10.4). The emission measure loci plots indicate that these brightenings should be multi-thermal whereas the background is isothermal. The differential emission measure as a function of temperature shows multiple peaks in the EUV brightening regions, while it has only a single peak (log T = 6.0) in the background region. Using Michelson Doppler Imager magnetograms, we have found that the type 1 brightening is associated with a canceling magnetic feature with a flux canceling rate of 2.4 x 10{sup 18} Mx hr{sup -1}. We also found the canceling magnetic feature and chromospheric brightenings in the type 1

  3. The solar extreme ultra-violet corona: Resolved loops and the unresolved active region corona

    NASA Astrophysics Data System (ADS)

    Cirtain, Jonathan Wesley

    In this work, physical characteristics of the solar corona as observed in the Extreme Ultra-Violet (EUV) regime are investigated. The focus will be the regions of intense EUV radiation generally found near the locations of sunspots. These regions are commonly called active regions. Multiple space- based observing platforms have been deployed in the last decade; it is possible to use several of these observatories in combination to develop a more complete picture of the solar corona. Joint Observing Program 146 was created to collect spectroscopic intensities using the Coronal Diagnostic Spectrometer on Solar and Heliospheric Observatory and EUV images using NASA's Transition Region and Coronal Explorer. The emission line intensities are analyzed to develop an understanding of the temperature and density of the active region coronal plasma. However, the performance of the CDS instrument in the spatial and temporal domains is limited and to compensate for these limitations, data collected by the TRACE instrument provide a high spatial and temporal resolution set of observations. One of the most exciting unsolved problems in solar astrophysics is to understand why the corona maintains a temperature roughly two orders of magnitude higher than the underlying material. A detailed investigation of the coronal emission has provided constraints on models of the heating mechanism, since the temperature, density and evolution of emission rates for multiple ionic species are indicative of the mechanism(s) working to heat the corona. The corona appears to consist of multiple unresolved structures as well as resolved active region structures, called coronal loops. The purpose of the present work is to determine the characteristics of the unresolved background corona. Using the characterizations of the coronal unresolved background, results for loops after background subtraction are also presented. This work demonstrates the magnitude of the unresolved coronal emission with

  4. X ray, extreme and far ultraviolet optical thin films for space applications

    NASA Technical Reports Server (NTRS)

    Zukic, Muamer; Torr, Douglas G.; Kim, Jongmin

    1993-01-01

    Far and extreme ultraviolet optical thin film filters find many uses in space astronomy, space astrophysics, and space aeronomy. Spacebased spectrographs are used for studying emission and absorption features of the earth, planets, sun, stars, and the interstellar medium. Most of these spectrographs use transmission or reflection filters. This requirement has prompted a search for selective filtering coatings with high throughput in the FUV and EUV spectral region. Important progress toward the development of thin film filters with improved efficiency and stability has been made in recent years. The goal for this field is the minimization of absorption to get high throughput and enhancement of wavelength selection. The Optical Aeronomy Laboratory (OAL) at the University of Alabama in Huntsville has recently developed the technology to determine optical constants of bulk and film materials for wavelengths extending from x-rays (0.1 nm) to the FUV (200 nm), and several materials have been identified that were used for designs of various optical devices which previously have been restricted to space application in the visible and near infrared. A new design concept called the Pi-multilayer was introduced and applied to the design of optical coatings for wavelengths extending from x-rays to the FUV. Section 3 of this report explains the Pi-multilayer approach and demonstrates its application for the design and fabrication of the FUV coatings. Two layer Pi-stacks have been utilized for the design of reflection filters in the EUV wavelength range from 70 - 100 nm. In order to eliminate losses due to the low reflection of the imaging optics and increase throughput and out-of-band rejection of the EUV instrumentation we introduced a self-filtering camera concept. In the FUV region, MgF2 and LiF crystals are known to be birefringent. Transmission polarizers and quarterwave retarders made of MgF2 or LiF crystals are commercially available but the performances are poor. New

  5. Comparison of solar radio and extreme ultraviolet synoptic limb charts during the present solar maximum

    NASA Astrophysics Data System (ADS)

    Oliveira e Silva, A. J.; Selhorst, C. L.; Simões, P. J. A.; Giménez de Castro, C. G.

    2016-08-01

    Aims: The present solar cycle is particular in many aspects: it had a delayed rising phase, it is the weakest of the last 100 yrs, and it presents two peaks separated by more than one year. To understand the impact of these characteristics on the solar chromosphere and coronal dynamics, images from a wide wavelength range are needed. In this work we use the 17 GHz radio continuum, which is formed in the upper chromosphere and the extreme ultraviolet (EUV) lines 304 and 171 Å, that come from the transition region (He ii, T ~ 6-8 × 104 K) and the corona (Fe IX, X, T ~ 106 K), respectively.We extend upon a previous similar analysis, and compare the mean equatorial and polar brightening behavior at radio and EUV wavelengths during the maximum of the present solar cycle, covering the period between 2010 and 2015. Methods: We analyze daily images at 304 and 171 Å obtained by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The 17 GHz maps were obtained by the Nobeyama Radioheliograph (NoRH). To construct synoptic limb charts, we calculated the mean emission of delimited limb areas with 100'' wide and angular separation of 5°. Results: At the equatorial region, the results show a hemispheric asymmetry of the solar activity. The northern hemisphere dominance is coincident with the first sunspot number peak, whereas the second peak occurs concurrently with the increase in the activity at the south. The polar emission reflects the presence of coronal holes at both EUV wavelengths, moreover, the 17 GHz polar brightenings can be associated with the coronal holes. Until 2013, both EUV coronal holes and radio polar brightenings were more predominant at the south pole.Since then they have not been apparent in the north, but thus appear in the beginning of 2015 in the south as observed in the synoptic charts. Conclusions: This work strengthens the association between coronal holes and the 17 GHz polar brightenings as it is evident in the

  6. Extreme Ultraviolet Late-Phase Flares: Before and During the Solar Dynamics Observatory Mission

    NASA Astrophysics Data System (ADS)

    Woods, Thomas N.

    2014-09-01

    The solar extreme-ultraviolet (EUV) observations from the Solar Dynamics Observatory (SDO) have revealed interesting characteristics of warm coronal emissions, such as Fe xvi 335 Å emission, which peak soon after the hot coronal X-ray emissions peak during a flare and then sometimes peak for a second time hours after the X-ray flare peak. This flare type, with two warm coronal emission peaks but only one X-ray peak, has been named the EUV late phase (Woods et al., Astrophys. J. 739, 59, 2011). These flares have the distinct properties of i) having a complex magnetic-field structure with two initial sets of coronal loops, with one upper set overlaying a lower set, ii) having an eruptive flare initiated in the lower set and disturbing both loop sets, iii) having the hot coronal emissions emitted only from the lower set in conjunction with the X-ray peak, and iv) having the first peak of the warm coronal emissions associated with the lower set and its second peak emitted from the upper set many minutes to hours after the first peak and without a second X-ray enhancement. The disturbance of the coronal loops by the eruption is at about the same time, but the relaxation and cooling down of the heated coronal loops during the post-flare reconnections have different time scales with the longer, upper loops being significantly delayed from the lower loops. The difference in these cooling time scales is related to the difference between the two peak times of the warm coronal emission and is also apparent in the decay profile of the X-ray emissions having two distinct decays, with the first decay slope being steeper (faster) and the delayed decay slope being smaller (slower) during the time of the warm-coronal-emission second peak. The frequency and relationship of the EUV late-phase decay times between the Fe xvi 335 Å two flare peaks and X-ray decay slopes are examined using three years of SDO/ EUV Variability Experiment (EVE) data, and the X-ray dual-decay character is

  7. Exploring the matter of extremes at the Linac Coherent Light source

    NASA Astrophysics Data System (ADS)

    Lee, Hae Ja

    2013-10-01

    A new technique using the Linac Coherent Light Source (LCLS), an x-ray free electron laser source, was developed at Matter in Extreme Conditions (MEC) endstation to study wide range of extreme conditions in phase space. The LCLS has >=3 mJ per 60 fs pulse enabling an intensity x-ray beam between 4 keV -9.5 keV to be focused onto a small spot ~ 2 micron at MEC. Short pulse optical laser system with 40 fs, 150 mJ, 10 Hz at 800 nm and long pulse optical laser system with variable pulse duration of 2-200 ns, <50 J, 1 shot/7 min at 527 nm serve to create high energy density state or shock compression state. MEC instrument is equipped with a suite of target diagnostics like as emission spectrometers, scattering spectrometers, area detectors for x-ray diffraction, VISAR, and FDI. We present capabilities of the MEC instrument and give an overview of several experiments which are performed at MEC. MEC instrument is funded and operated by the US Department of Energy, Office of Science, Fusion Energy Science. LCLS is an Office of Science User Facility operated for the U.S. Department of Energy Office of Science by Stanford University.

  8. Access to phases of coherent phonon excitations by femtosecond ultraviolet photoelectron diffraction

    NASA Astrophysics Data System (ADS)

    Greif, M.; Kasmi, L.; Castiglioni, L.; Lucchini, M.; Gallmann, L.; Keller, U.; Osterwalder, J.; Hengsberger, M.

    2016-08-01

    Coherent phonons are an excellent tool to investigate the interplay between electronic and structural dynamics. The displacive excitation of coherent phonons in elemental bismuth is one of the most widely studied processes for this purpose. We employ time-resolved photoelectron diffraction to access the structural dynamics by recording the photoemission intensity from one initial state as a function of emission angle. In comparison with tight-binding and single-scattering cluster calculations, this allows electronic and structural effects to be disentangled. Hence, the full dynamics of the hot electron gas and of coherently excited phonons can be accessed in a single experiment. As a major result the phase lag between the coherent phonons and the modulation of the electronic structure can be determined with high precision. The phonon phase lag with respect to the modulation of the electronic structure is about 2.85 ±0.21 rad, thus significantly smaller than π . The difference is not due to phonon decay by energy dissipation into low-energy modes, but rather caused by the very early evolution of the highly excited electron distribution.

  9. Attosecond transient absorption of argon atoms in the vacuum ultraviolet region: line energy shifts versus coherent population transfer

    NASA Astrophysics Data System (ADS)

    Cao, Wei; Warrick, Erika R.; Neumark, Daniel M.; Leone, Stephen R.

    2016-01-01

    Using attosecond transient absorption, the dipole response of an argon atom in the vacuum ultraviolet (VUV) region is studied when an external electromagnetic field is present. An isolated attosecond VUV pulse populates Rydberg states lying 15 eV above the argon ground state. A synchronized few-cycle near infrared (NIR) pulse modifies the oscillating dipoles of argon impulsively, leading to alterations in the VUV absorption spectra. As the NIR pulse is delayed with respect to the VUV pulse, multiple features in the absorption profile emerge simultaneously including line broadening, sideband structure, sub-cycle fast modulations, and 5-10 fs slow modulations. These features indicate the coexistence of two general processes of the light-matter interaction: the energy shift of individual atomic levels and coherent population transfer between atomic eigenstates, revealing coherent superpositions. An intuitive formula is derived to treat both effects in a unifying framework, allowing one to identify and quantify the two processes in a single absorption spectrogram.

  10. Up-down asymmetry measurement of tungsten distribution in large helical device using two extreme ultraviolet (EUV) spectrometers

    NASA Astrophysics Data System (ADS)

    Liu, Y.; Morita, S.; Huang, X. L.; Oishi, T.; Goto, M.; Zhang, H. M.

    2016-11-01

    Two space-resolved extreme ultraviolet spectrometers working in wavelength ranges of 10-130 Å and 30-500 Å have been utilized to observe the full vertical profile of tungsten line emissions by simultaneously measuring upper- and lower-half plasmas of LHD, respectively. The radial profile of local emissivity is reconstructed from the measured vertical profile in the overlapped wavelength range of 30-130 Å and the up-down asymmetry is examined against the local emissivity profiles of WXXVIII in the unresolved transition array spectrum. The result shows a nearly symmetric profile, suggesting a good availability in the present diagnostic method for the impurity asymmetry study.

  11. Production of narrowband tunable extreme-ultraviolet radiation by noncollinear resonance-enhanced four-wave mixing.

    PubMed

    Hannemann, S; Hollenstein, U; van Duijn, E J; Ubachs, W

    2005-06-15

    Fourier-transform-limited extreme-ultraviolet (XUV) radiation (bandwidth approximately < 300 MHz) tunable around 91 nm is produced by use of two-photon resonance-enhanced four-wave mixing on the Kr resonance at 94 093 cm(-1). Noncollinear phase matching ensures the generation of an XUV sum frequency 2 omega1 + omega2 that can be filtered from auxiliary laser beams and harmonics by an adjustable slit. Application of the generated XUV light is demonstrated in spectroscopic investigations of highly excited states in H2 and N2.

  12. The Laser-assisted photoelectric effect of He, Ne, Ar and Xe in intense extreme ultraviolet and infrared laser fields

    NASA Astrophysics Data System (ADS)

    Hayden, P.; Dardis, J.; Hough, P.; Richardson, V.; Kennedy, E. T.; Costello, J. T.; Düsterer, S.; Redlin, H.; Feldhaus, J.; Li, W. B.; Cubaynes, D.; Meyer, M.

    2016-02-01

    In this paper, we report results on two-colour above-threshold ionisation, where extreme ultraviolet pulses of femtosecond duration were synchronised to intense infrared laser pulses of picosecond duration, in order to study the laser-assisted photoelectric effect of atomic helium, neon, krypton and xenon which leads to the appearance of characteristic sidebands in the photoelectron spectra. The observed trends are found to be well described by a simple model based on the soft-photon approximation, at least for the relatively low optical intensities of up to ? employed in these early experiments.

  13. Extreme ultraviolet ionization of pure He nanodroplets: mass-correlated photoelectron imaging, Penning ionization, and electron energy-loss spectra.

    PubMed

    Buchta, D; Krishnan, S R; Brauer, N B; Drabbels, M; O'Keeffe, P; Devetta, M; Di Fraia, M; Callegari, C; Richter, R; Coreno, M; Prince, K C; Stienkemeier, F; Ullrich, J; Moshammer, R; Mudrich, M

    2013-08-28

    The ionization dynamics of pure He nanodroplets irradiated by Extreme ultraviolet radiation is studied using Velocity-Map Imaging PhotoElectron-PhotoIon COincidence spectroscopy. We present photoelectron energy spectra and angular distributions measured in coincidence with the most abundant ions He(+), He2(+), and He3(+). Surprisingly, below the autoionization threshold of He droplets, we find indications for multiple excitation and subsequent ionization of the droplets by a Penning-like process. At high photon energies we observe inelastic collisions of photoelectrons with the surrounding He atoms in the droplets.

  14. Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source.

    PubMed

    Naulleau, Patrick P; Anderson, Christopher N; Anderson, Erik H; Andreson, Nord; Chao, Weilun; Choi, Changhoon; Goldberg, Kenneth A; Gullikson, Eric M; Kim, Seong-Sue; Lee, Donggun; Miyakawa, Ryan; Park, Jongju; Rekawa, Seno; Salmassi, Farhad

    2014-08-25

    A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has been designed to work with stand-alone commercially available EUV high harmonic generation (HHG) sources through the implementation of narrowband harmonic selecting multilayers and off-axis elliptical short focal length zoneplates. The module has been successfully integrated into an EUV mask scanning microscope achieving diffraction limited imaging performance (84 nm point spread function). PMID:25321224

  15. Extreme ultraviolet spectra from highly charged gadolinium and neodymium ions in the Large Helical Device and laser produced plasmas

    NASA Astrophysics Data System (ADS)

    Suzuki, C.; Koike, F.; Murakami, I.; Tamura, N.; Sudo, S.; O'Gorman, C.; Li, B.; Harte, C. S.; Donnelly, T.; O'Sullivan, G.

    2013-09-01

    We have observed extreme ultraviolet spectra from highly charged gadolinium (Gd) and neodymium (Nd) ions produced in two different types of light sources for comparative studies. Only broad quasicontinuum feature arising from unresolved transition array was observed in high-density laser produced plasmas of pure/diluted Gd and Nd targets at the University College Dublin, and the spectral feature largely depends on electron temperature in optically thin plasmas produced in the Large Helical Device at the National Institute for Fusion Science. The difference in spectral feature among a number of spectra can be qualitatively interpreted by considering dominant ion stages and opacity effects in the plasmas.

  16. Surface modification of organic polymer by dual action of extreme ultraviolet/visible-near infrared ultrashort pulses

    NASA Astrophysics Data System (ADS)

    Mocek, T.; Polan, J.; Homer, P.; Jakubczak, K.; Rus, B.; Kim, I. J.; Kim, C. M.; Lee, G. H.; Nam, C. H.; Hájková, V.; Chalupský, J.; Juha, L.

    2009-01-01

    We present the experimental evidence of structural surface modifications of poly(methyl methacrylate) (PMMA) caused by simultaneous action of extreme ultraviolet (XUV) (˜21 nm) and visible-near infrared (visible-NIR) (820/410 nm) ultrashort pulses. Although the fluence of each individual beam was far below the surface modification threshold, very efficient and specific material expansion was observed after irradiation of PMMA by more than ˜20 shots of mixed XUV/visible-NIR radiation. As the XUV photons generate free charge carriers, absorption of the optical radiation dramatically increases, which heats up the material and further enhances the XUV induced damage to the polymer chain.

  17. Extreme-Ultraviolet Flux from the Virgo Cluster: Further Evidence for a 500,000-Kelvin Component

    PubMed

    Bowyer; Lampton; Lieu

    1996-11-22

    A surprising discovery in x-ray astronomy was that clusters of galaxies often contain vast quantities of hot (20 million kelvin) diffuse gas. Substantial diffuse extreme-ultraviolet (EUV) emission has recently been detected in the Virgo cluster of galaxies. Depending on the character of the interstellar medium in our galaxy, this emission could be either an aspect of the hot cluster gas or a previously undetected 500,000-kelvin component. Analysis of the observational data in combination with our current knowledge of the interstellar medium revealed that the EUV flux cannot be an effect of the interstellar medium. Hence, a warm cluster component appears likely.

  18. Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam.

    PubMed

    Barty, Anton; Hau-Riege, Stefan; Stearns, Dan; Clift, Miles; Mirkarimi, Paul; Gullikson, Eric; Chapman, Henry; Sweeney, Don

    2004-12-20

    We present a method for repairing defects near the top surfaces of multilayer coatings in general and specifically on extreme-ultraviolet lithography mask blanks. Milling away the defect and a surrounding region of the multilayer by use of a focused ion beam can repair both the reflectivity and the phase of the reflected light in the vicinity of such a defect. We describe the conditions under which the repaired region will not itself be a defect and experimentally demonstrate the feasibility of this multilayer repair technique. The results described are also applicable to understanding and controlling the optical effects of ion-induced multilayer erosion.

  19. OBSERVATIONS OF FIVE-MINUTE SOLAR OSCILLATIONS IN THE CORONA USING THE EXTREME ULTRAVIOLET SPECTROPHOTOMETER (ESP) ON BOARD THE SOLAR DYNAMICS OBSERVATORY EXTREME ULTRAVIOLET VARIABILITY EXPERIMENT (SDO/EVE)

    SciTech Connect

    Didkovsky, L.; Judge, D.; Wieman, S.; Kosovichev, A. G.; Woods, T.

    2011-09-01

    We report on the detection of oscillations in the corona in the frequency range corresponding to five-minute acoustic modes of the Sun. The oscillations have been observed using soft X-ray measurements from the Extreme Ultraviolet Spectrophotometer (ESP) of the Extreme Ultraviolet Variability Experiment on board the Solar Dynamics Observatory. The ESP zeroth-order channel observes the Sun as a star without spatial resolution in the wavelength range of 0.1-7.0 nm (the energy range is 0.18-12.4 keV). The amplitude spectrum of the oscillations calculated from six-day time series shows a significant increase in the frequency range of 2-4 mHz. We interpret this increase as a response of the corona to solar acoustic (p) modes and attempt to identify p-mode frequencies among the strongest peaks. Due to strong variability of the amplitudes and frequencies of the five-minute oscillations in the corona, we study how the spectrum from two adjacent six-day time series combined together affects the number of peaks associated with the p-mode frequencies and their amplitudes. This study shows that five-minute oscillations of the Sun can be observed in the corona in variations of the soft X-ray emission. Further investigations of these oscillations may improve our understanding of the interaction of the oscillation modes with the solar atmosphere, and the interior-corona coupling, in general.

  20. Orbiting Retrievable Far and Extreme Ultraviolet Spectrometer - Shuttle Pallet Satellite (ORFEUS-SPAS)

    NASA Technical Reports Server (NTRS)

    1993-01-01

    The objective of the ORFEUS mission is to launch a deployable/retrievable astronomical platform and obtain ultraviolet spectra for both astrophysically interesting sources and the intervening interstellar medium. Also, the IMAX cameras will obtain footage of both the Shuttle and the ORFEUS-SPAS satellite during the deployment/retrieval operations phase of the ORFEUS-SPAS mission.

  1. Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system.

    PubMed

    Nowak, Krzysztof M; Ohta, Takeshi; Suganuma, Takashi; Yokotsuka, Toshio; Fujimoto, Junichi; Mizoguchi, Hakaru

    2012-12-01

    Quantum cascade laser (QCL) is a very attractive seed source for a multikilowatt pulsed CO2 lasers applied for driving extreme ultraviolet emitting plasmas. In this Letter, we investigate output beam properties of a QCL designed to address P18 and P20 lines of 10.6 micron band of CO2 molecule. In particular, output beam quality and stability are investigated for the first time. A well-defined linear polarization and a single-mode operation enabled a use of phase retrieval method for full description of QCL output beam. A direct, multi-image numerical phase retrieval technique was developed and successfully applied to the measured intensity patterns of a QCL beam. Very good agreement between the measured and reconstructed beam profiles was observed at distances ranging from QCL aperture to infinity, proving a good understanding of the beam propagation. The results also confirm a high spatial coherence and high stability of the beam parameters, the features expected from an excellent seed source.

  2. Development of experimental techniques for the characterization of ultrashort photon pulses of extreme ultraviolet free-electron lasers

    NASA Astrophysics Data System (ADS)

    Düsterer, S.; Rehders, M.; Al-Shemmary, A.; Behrens, C.; Brenner, G.; Brovko, O.; DellAngela, M.; Drescher, M.; Faatz, B.; Feldhaus, J.; Frühling, U.; Gerasimova, N.; Gerken, N.; Gerth, C.; Golz, T.; Grebentsov, A.; Hass, E.; Honkavaara, K.; Kocharian, V.; Kurka, M.; Limberg, Th.; Mitzner, R.; Moshammer, R.; Plönjes, E.; Richter, M.; Rönsch-Schulenburg, J.; Rudenko, A.; Schlarb, H.; Schmidt, B.; Senftleben, A.; Schneidmiller, E. A.; Siemer, B.; Sorgenfrei, F.; Sorokin, A. A.; Stojanovic, N.; Tiedtke, K.; Treusch, R.; Vogt, M.; Wieland, M.; Wurth, W.; Wesch, S.; Yan, M.; Yurkov, M. V.; Zacharias, H.; Schreiber, S.

    2014-12-01

    One of the most challenging tasks for extreme ultraviolet, soft and hard x-ray free-electron laser photon diagnostics is the precise determination of the photon pulse duration, which is typically in the sub 100 fs range. Nine different methods, able to determine such ultrashort photon pulse durations, were compared experimentally at FLASH, the self-amplified spontaneous emission free-electron laser at DESY in Hamburg, in order to identify advantages and disadvantages of different methods. Radiation pulses at a wavelength of 13.5 and 24.0 nm together with the corresponding electron bunch duration were measured by indirect methods like analyzing spectral correlations, statistical fluctuations, and energy modulations of the electron bunch and also by direct methods like autocorrelation techniques, terahertz streaking, or reflectivity changes of solid state samples. In this paper, we present a comprehensive overview of the various techniques and a comparison of the individual experimental results. The information gained is of utmost importance for the future development of reliable pulse duration monitors indispensable for successful experiments with ultrashort extreme ultraviolet pulses.

  3. Extreme ultraviolet light curves of UZ Fornacis: Evidence for accretion stream absorption and vertical extent of the accretion spot

    NASA Technical Reports Server (NTRS)

    Warren, John K.; Sirk, Martin M.; Vallerga, John V.

    1995-01-01

    We report on two pointed observations of UZ For carried out by the imaging photometers aboard the Extreme Ultraviolet Explorer (EUVE), one as part of the EUVE Right Angle Program and one as an off-axis source during a guest observation. Both observations lasted approximately 3 days and covered a total of 72 orbits of the UZ For binary providing multiple coverage of all the orbital phases of UZ For. The resulting high signal-to-noise phase-folded light curve strongly constrains the emission and absorption geometry of UZ For. We have detected a narrow absorption dip that we attribute to the accretion stream at the location of the stagnation region many white dwarf radii away from the accretion spot and have also detected a broad dip caused by absorption much closer to the white dwarf surface. Both absorption effects are variable in time and phase. Based on the timescales of M-star eclipse ingress and egress, the angular spot size is constrained to be less than 5 deg; thus the ratio of spot area to white dwarf surface area is less than or equal to 0.0005. To explain the light curve phase duration given this small angular spot size, the extreme-ultraviolet (EUV) accretion spot must be raised vertically by approximately 5% of the white dwarf radius.

  4. Matter under extreme conditions experiments at the Linac Coherent Light Source

    NASA Astrophysics Data System (ADS)

    Glenzer, S. H.; Fletcher, L. B.; Galtier, E.; Nagler, B.; Alonso-Mori, R.; Barbrel, B.; Brown, S. B.; Chapman, D. A.; Chen, Z.; Curry, C. B.; Fiuza, F.; Gamboa, E.; Gauthier, M.; Gericke, D. O.; Gleason, A.; Goede, S.; Granados, E.; Heimann, P.; Kim, J.; Kraus, D.; MacDonald, M. J.; Mackinnon, A. J.; Mishra, R.; Ravasio, A.; Roedel, C.; Sperling, P.; Schumaker, W.; Tsui, Y. Y.; Vorberger, J.; Zastrau, U.; Fry, A.; White, W. E.; Hasting, J. B.; Lee, H. J.

    2016-05-01

    The matter in extreme conditions end station at the Linac Coherent Light Source (LCLS) is a new tool enabling accurate pump–probe measurements for studying the physical properties of matter in the high-energy density (HED) physics regime. This instrument combines the world’s brightest x-ray source, the LCLS x-ray beam, with high-power lasers consisting of two nanosecond Nd:glass laser beams and one short-pulse Ti:sapphire laser. These lasers produce short-lived states of matter with high pressures, high temperatures or high densities with properties that are important for applications in nuclear fusion research, laboratory astrophysics and the development of intense radiation sources. In the first experiments, we have performed highly accurate x-ray diffraction and x-ray Thomson scattering measurements on shock-compressed matter resolving the transition from compressed solid matter to a co-existence regime and into the warm dense matter state. These complex charged-particle systems are dominated by strong correlations and quantum effects. They exist in planetary interiors and laboratory experiments, e.g., during high-power laser interactions with solids or the compression phase of inertial confinement fusion implosions. Applying record peak brightness x-rays resolves the ionic interactions at atomic (Ångstrom) scale lengths and measure the static structure factor, which is a key quantity for determining equation of state data and important transport coefficients. Simultaneously, spectrally resolved measurements of plasmon features provide dynamic structure factor information that yield temperature and density with unprecedented precision at micron-scale resolution in dynamic compression experiments. These studies have demonstrated our ability to measure fundamental thermodynamic properties that determine the state of matter in the HED physics regime.

  5. Matter under extreme conditions experiments at the Linac Coherent Light Source

    NASA Astrophysics Data System (ADS)

    Glenzer, S. H.; Fletcher, L. B.; Galtier, E.; Nagler, B.; Alonso-Mori, R.; Barbrel, B.; Brown, S. B.; Chapman, D. A.; Chen, Z.; Curry, C. B.; Fiuza, F.; Gamboa, E.; Gauthier, M.; Gericke, D. O.; Gleason, A.; Goede, S.; Granados, E.; Heimann, P.; Kim, J.; Kraus, D.; MacDonald, M. J.; Mackinnon, A. J.; Mishra, R.; Ravasio, A.; Roedel, C.; Sperling, P.; Schumaker, W.; Tsui, Y. Y.; Vorberger, J.; Zastrau, U.; Fry, A.; White, W. E.; Hasting, J. B.; Lee, H. J.

    2016-05-01

    The matter in extreme conditions end station at the Linac Coherent Light Source (LCLS) is a new tool enabling accurate pump-probe measurements for studying the physical properties of matter in the high-energy density (HED) physics regime. This instrument combines the world’s brightest x-ray source, the LCLS x-ray beam, with high-power lasers consisting of two nanosecond Nd:glass laser beams and one short-pulse Ti:sapphire laser. These lasers produce short-lived states of matter with high pressures, high temperatures or high densities with properties that are important for applications in nuclear fusion research, laboratory astrophysics and the development of intense radiation sources. In the first experiments, we have performed highly accurate x-ray diffraction and x-ray Thomson scattering measurements on shock-compressed matter resolving the transition from compressed solid matter to a co-existence regime and into the warm dense matter state. These complex charged-particle systems are dominated by strong correlations and quantum effects. They exist in planetary interiors and laboratory experiments, e.g., during high-power laser interactions with solids or the compression phase of inertial confinement fusion implosions. Applying record peak brightness x-rays resolves the ionic interactions at atomic (Ångstrom) scale lengths and measure the static structure factor, which is a key quantity for determining equation of state data and important transport coefficients. Simultaneously, spectrally resolved measurements of plasmon features provide dynamic structure factor information that yield temperature and density with unprecedented precision at micron-scale resolution in dynamic compression experiments. These studies have demonstrated our ability to measure fundamental thermodynamic properties that determine the state of matter in the HED physics regime.

  6. Non-coherent near infrared radiation protects normal human dermal fibroblasts from solar ultraviolet toxicity.

    PubMed

    Menezes, S; Coulomb, B; Lebreton, C; Dubertret, L

    1998-10-01

    The sun is the most important and universal source of non-ionizing radiation shed on human populations. Life evolved on Earth bathed by this radiation. Solar UV damages cells, leading to deleterious conditions such as photoaging and carcinogenesis in human skin. During the process of evolution, the cells selected dark- and light-dependent repair mechanisms as a defence against these hazardous effects. This study describes the induction by non-coherent infrared radiation (700-2000 nm), in the absence of rising temperature, of a strong cellular defense against solar UV cytotoxicity as well as induction of cell mitosis. Blocking mitoses with arabinoside-cytosine or protein synthesis with cycloheximide did not abolish the protection, leading to the conclusion that this protection is independent of cell division and of protein neosynthesis. The protection provided by infrared radiation against solar UV radiation is shown to be a long-lasting (at least 24 h) and cumulatif phenomenon. Infrared radiation does not protect the lipids in cellular membranes against UVA induced peroxidation. The protection is not mediated by heat shock proteins. Living organisms on the Earth's surface are bathed by infrared radiation every day, before being submitted to solar UV. Thus, we propose that this as yet undescribed natural process of cell protection against solar UV, acquired and preserved through evolutional selection, plays an important role in life maintenance. Understanding and controlling this mechanism could provide important keys to the prevention of solar UV damage of human skin.

  7. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

    DOEpatents

    Ruffner, Judith Alison

    1999-01-01

    A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.

  8. Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

    DOEpatents

    Ruffner, J.A.

    1999-06-15

    A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet (DUV) and Extreme Ultra-Violet (EUV) wavelengths. The method results in a product with minimum feature sizes of less than 0.10 [micro]m for the shortest wavelength (13.4 nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R[sup 2] factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates. 15 figs.

  9. Resonant magnetic reflectivity in the extreme ultraviolet spectral range: Interlayer-coupled Co/Si/Ni/Fe multilayer system

    NASA Astrophysics Data System (ADS)

    Grychtol, P.; Adam, R.; Valencia, S.; Cramm, S.; Bürgler, D. E.; Schneider, C. M.

    2010-08-01

    A polycrystalline test structure comprising a 5 nm cobalt and a 10 nm nickel/iron layer separated by a silicon layer ranging from 1.5 to 4 nm prepared by thermal evaporation has been investigated by resonant magnetic reflectivity measurements of horizontally polarized light in the extreme ultraviolet spectral range. By exploiting the transversal magneto-optical Kerr effect at the M absorption edges of cobalt and nickel (59.5 eV and 66.5 eV) a magnetic contrast as large as 80% for cobalt and 25% for nickel can be obtained near a Brewster angle of about 45° . Angle- and energy-dependent scans of the magnetic asymmetry as well as element-selective, magneto-optical loops of the hysteresis were recorded against the thickness of the interlayer, reflecting the switching behavior of the individual ferromagnetic layers as a function of the interlayer coupling.

  10. A Solar Type II Radio Burst from Coronal Mass Ejection-Coronal Ray Interaction: Simultaneous Radio and Extreme Ultraviolet Imaging

    NASA Astrophysics Data System (ADS)

    Chen, Yao; Du, Guohui; Feng, Li; Feng, Shiwei; Kong, Xiangliang; Guo, Fan; Wang, Bing; Li, Gang

    2014-05-01

    Simultaneous radio and extreme ultraviolet (EUV)/white-light imaging data are examined for a solar type II radio burst occurring on 2010 March 18 to deduce its source location. Using a bow-shock model, we reconstruct the three-dimensional EUV wave front (presumably the type-II-emitting shock) based on the imaging data of the two Solar TErrestrial RElations Observatory spacecraft. It is then combined with the Nançay radio imaging data to infer the three-dimensional position of the type II source. It is found that the type II source coincides with the interface between the coronal mass ejection (CME) EUV wave front and a nearby coronal ray structure, providing evidence that the type II emission is physically related to the CME-ray interaction. This result, consistent with those of previous studies, is based on simultaneous radio and EUV imaging data for the first time.

  11. Measurement of single mode imprint in laser ablative drive of a thin Al foil by extreme ultraviolet laser radiography

    SciTech Connect

    Wolfrum, E.; Wark, J.; Zhang, J.; Kalantar, D.; Key, M.H.; Remington, B.A.; Weber, S.V.; Neely, D.; Rose, S.; Warwick, J.; MacPhee, A.; Lewis, C.L.; Demir, A.; Lin, J.; Smith, R.; Tallents, G.J.

    1998-01-01

    The temporal development of laser driven single mode perturbations in thin Al foils has been measured using extreme ultraviolet (XUV) laser radiography. 15, 30, 70 and 90 {mu}m single modes were imprinted on 2 {mu}m thick Al foils with an optical driver laser at 527 nm for intensities in the range 5{times}10{sup 12} to 1.5{times}10{sup 13}Wcm{sup {minus}2}. The magnitude of the imprinted perturbation at the time of shock break out was determined by fitting to the data estimated curves of growth of the Rayleigh{endash}Taylor instability after shock break out. The efficiency of imprinting is independent of perturbation wavelength in the parameter range of this experiment, suggesting little influence of thermal conduction smoothing. The results are of interest for directly driven inertially confined fusion. {copyright} {ital 1998 American Institute of Physics.}

  12. Characteristics of extreme ultraviolet emission from mid-infrared laser-produced rare-earth Gd plasmas.

    PubMed

    Higashiguchi, Takeshi; Li, Bowen; Suzuki, Yuhei; Kawasaki, Masato; Ohashi, Hayato; Torii, Shuichi; Nakamura, Daisuke; Takahashi, Akihiko; Okada, Tatsuo; Jiang, Weihua; Miura, Taisuke; Endo, Akira; Dunne, Padraig; O'Sullivan, Gerry; Makimura, Tetsuya

    2013-12-30

    We characterize extreme ultraviolet (EUV) emission from mid-infrared (mid-IR) laser-produced plasmas (LPPs) of the rare-earth element Gd. The energy conversion efficiency (CE) and the spectral purity in the mid-IR LPPs at λL = 10.6 μm were higher than for solid-state LPPs at λL = 1.06 μm, because the plasma produced is optically thin due to the lower critical density, resulting in a CE of 0.7%. The peak wavelength remained fixed at 6.76 nm for all laser intensities studied. Plasma parameters at a mid-IR laser intensity of 1.3×10(11) W/cm(2) was also evaluated by use of the hydrodynamic simulation code to produce the EUV emission at 6.76 nm. PMID:24514779

  13. Materials Properties and Solvated Electron Dynamics of Isolated Nanoparticles and Nanodroplets Probed with Ultrafast Extreme Ultraviolet Beams.

    PubMed

    Ellis, Jennifer L; Hickstein, Daniel D; Xiong, Wei; Dollar, Franklin; Palm, Brett B; Keister, K Ellen; Dorney, Kevin M; Ding, Chengyuan; Fan, Tingting; Wilker, Molly B; Schnitzenbaumer, Kyle J; Dukovic, Gordana; Jimenez, Jose L; Kapteyn, Henry C; Murnane, Margaret M

    2016-02-18

    We present ultrafast photoemission measurements of isolated nanoparticles in vacuum using extreme ultraviolet (EUV) light produced through high harmonic generation. Surface-selective static EUV photoemission measurements were performed on nanoparticles with a wide array of compositions, ranging from ionic crystals to nanodroplets of organic material. We find that the total photoelectron yield varies greatly with nanoparticle composition and provides insight into material properties such as the electron mean free path and effective mass. Additionally, we conduct time-resolved photoelectron yield measurements of isolated oleylamine nanodroplets, observing that EUV photons can create solvated electrons in liquid nanodroplets. Using photoemission from a time-delayed 790 nm pulse, we observe that a solvated electron is produced in an excited state and subsequently relaxes to its ground state with a lifetime of 151 ± 31 fs. This work demonstrates that femotosecond EUV photoemission is a versatile surface-sensitive probe of the properties and ultrafast dynamics of isolated nanoparticles. PMID:26807653

  14. Effects of the dynamics of droplet-based laser-produced plasma on angular extreme ultraviolet emission profile

    SciTech Connect

    Giovannini, Andrea Z.; Abhari, Reza S.

    2014-05-12

    The emission distribution of extreme ultraviolet (EUV) radiation from droplet targets is dependent on the dynamics of the laser-produced plasma. The EUV emission is measured on a 2% bandwidth centered at 13.5 nm (in-band). The targets of the laser are small (sub-50 μm) tin droplets, and the in-band emission distribution is measured for different laser irradiances and droplet sizes at various angular positions. Larger droplets lead to a faster decay of EUV emission at larger angles with respect to the laser axis. A decrease in laser irradiance has the opposite effect. The measurements are used together with an analytical model to estimate plume dynamics. Additionally, the model is used to estimate EUV emission distribution for a desired droplet diameter and laser irradiance.

  15. A solar type II radio burst from coronal mass ejection-coronal ray interaction: Simultaneous radio and extreme ultraviolet imaging

    SciTech Connect

    Chen, Yao; Du, Guohui; Feng, Shiwei; Kong, Xiangliang; Wang, Bing; Feng, Li; Guo, Fan; Li, Gang

    2014-05-20

    Simultaneous radio and extreme ultraviolet (EUV)/white-light imaging data are examined for a solar type II radio burst occurring on 2010 March 18 to deduce its source location. Using a bow-shock model, we reconstruct the three-dimensional EUV wave front (presumably the type-II-emitting shock) based on the imaging data of the two Solar TErrestrial RElations Observatory spacecraft. It is then combined with the Nançay radio imaging data to infer the three-dimensional position of the type II source. It is found that the type II source coincides with the interface between the coronal mass ejection (CME) EUV wave front and a nearby coronal ray structure, providing evidence that the type II emission is physically related to the CME-ray interaction. This result, consistent with those of previous studies, is based on simultaneous radio and EUV imaging data for the first time.

  16. Extended-range grazing-incidence spectrometer for high-resolution extreme ultraviolet measurements on an electron beam ion trap.

    PubMed

    Beiersdorfer, P; Magee, E W; Brown, G V; Hell, N; Träbert, E; Widmann, K

    2014-11-01

    A high-resolution grazing-incidence grating spectrometer has been implemented on the Livermore electron beam ion traps for performing very high-resolution measurements in the soft x-ray and extreme ultraviolet region spanning from below 10 Å to above 300 Å. The instrument operates without an entrance slit and focuses the light emitted by highly charged ions located in the roughly 50 μm wide electron beam onto a cryogenically cooled back-illuminated charge-coupled device detector. The measured line widths are below 0.025 Å above 100 Å, and the resolving power appears to be limited by the source size and Doppler broadening of the trapped ions. Comparisons with spectra obtained with existing grating spectrometers show an order of magnitude improvement in spectral resolution.

  17. Extended-range grazing-incidence spectrometer for high-resolution extreme ultraviolet measurements on an electron beam ion trap

    SciTech Connect

    Beiersdorfer, P.; Magee, E. W.; Brown, G. V.; Träbert, E.; Widmann, K.; Hell, N.

    2014-11-15

    A high-resolution grazing-incidence grating spectrometer has been implemented on the Livermore electron beam ion traps for performing very high-resolution measurements in the soft x-ray and extreme ultraviolet region spanning from below 10 Å to above 300 Å. The instrument operates without an entrance slit and focuses the light emitted by highly charged ions located in the roughly 50 μm wide electron beam onto a cryogenically cooled back-illuminated charge-coupled device detector. The measured line widths are below 0.025 Å above 100 Å, and the resolving power appears to be limited by the source size and Doppler broadening of the trapped ions. Comparisons with spectra obtained with existing grating spectrometers show an order of magnitude improvement in spectral resolution.

  18. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

    SciTech Connect

    Soufli, R; Hudyma, R M; Spiller, E; Gullikson, E M; Schmidt, M A; Robinson, J C; Baker, S L; Walton, C C; Taylor, J S

    2007-01-03

    This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.

  19. Extreme ultraviolet spectroscopy diagnostics of low-temperature plasmas based on a sliced multilayer grating and glass capillary optics

    SciTech Connect

    Kantsyrev, V. L.; Safronova, A. S.; Williamson, K. M.; Wilcox, P.; Ouart, N. D.; Yilmaz, M. F.; Struve, K. W.; Voronov, D. L.; Feshchenko, R. M.; Artyukov, I. A.; Vinogradov, A. V.

    2008-10-15

    New extreme ultraviolet (EUV) spectroscopic diagnostics of relatively low-temperature plasmas based on the application of an EUV spectrometer and fast EUV diodes combined with glass capillary optics is described. An advanced high resolution dispersive element sliced multilayer grating was used in the compact EUV spectrometer. For monitoring of the time history of radiation, filtered fast EUV diodes were used in the same spectral region (>13 nm) as the EUV spectrometer. The radiation from the plasma was captured by using a single inexpensive glass capillary that was transported onto the spectrometer entrance slit and EUV diode. The use of glass capillary optics allowed placement of the spectrometer and diodes behind the thick radiation shield outside the direction of a possible hard x-ray radiation beam and debris from the plasma source. The results of the testing and application of this diagnostic for a compact laser plasma source are presented. Examples of modeling with parameters of plasmas are discussed.

  20. In-flight estimation of gyro noise on the Upper Atmosphere Research Satellite (UARS) and Extreme Ultraviolet Explorer (EUVE) missions

    NASA Technical Reports Server (NTRS)

    Lee, M.; Crouse, P.; Harman, R.; Leid, Terry; Davis, W.; Underwood, S.

    1994-01-01

    This paper characterizes the low-frequency noise response of the Teledyne dry rotor inertial reference unit (DRIRU) gyroscopes on the Upper Atmosphere Research Satellite (UARS) and the Extreme Ultraviolet Explorer (EUVE). The accuracy of spacecraft attitude estimation algorithms that use gyro data for propagating the spacecraft attitude is sensitive to gyro noise. EUVE gyro data were processed to validate a single-axis gyro noise model, which is used onboard various spacecraft. The paper addresses the potential impact of temperature effects on the gyro noise model and the overall impact on attitude determination accuracy. The power spectral density (PSD) of the gyro noise is estimated from UARS in-flight data by Fast Fourier Transform (FFT). The role of actuator dynamics on the PSD function is also discussed.

  1. QUADRATURE OBSERVATIONS OF WAVE AND NON-WAVE COMPONENTS AND THEIR DECOUPLING IN AN EXTREME-ULTRAVIOLET WAVE EVENT

    SciTech Connect

    Dai, Y.; Ding, M. D.; Chen, P. F.; Zhang, J.

    2012-11-01

    We report quadrature observations of an extreme-ultraviolet (EUV) wave event on 2011 January 27 obtained by the Extreme Ultraviolet Imager on board the Solar Terrestrial Relations Observatory, and the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Two components are revealed in the EUV wave event. A primary front is launched with an initial speed of {approx}440 km s{sup -1}. It appears that significant emission enhancement occurs in the hotter channel while deep emission reduction occurs in the cooler channel. When the primary front encounters a large coronal loop system and slows down, a secondary, much fainter, front emanates from the primary front with a relatively higher starting speed of {approx}550 km s{sup -1}. Afterward, the two fronts propagate independently with increasing separation. The primary front finally stops at a magnetic separatrix, while the secondary front travels farther until it fades out. In addition, upon the arrival of the secondary front, transverse oscillations of a prominence are triggered. We suggest that the two components are of different natures. The primary front belongs to a non-wave coronal mass ejection (CME) component, which can be reasonably explained with the field-line stretching model. The multi-temperature behavior may be caused by considerable heating due to nonlinear adiabatic compression on the CME frontal loop. As for the secondary front, it is most likely a linear fast-mode magnetohydrodynamic wave that propagates through a medium of the typical coronal temperature. X-ray and radio data provide us with complementary evidence in support of the above scenario.

  2. The Solar Chromosphere/Corona Interface. I. Far-Ultraviolet to Extreme-Ultraviolet Observations and Modeling of Unresolved Coronal Funnels

    NASA Technical Reports Server (NTRS)

    Martinez-Galarce, Dennis S.; Walker, Arthur C., III; Barbee, Troy W., II; Hoover, Richard B.

    2003-01-01

    A coronal funnel model, developed by D. Rabin, was tested against a calibrated spectroheliogram recorded in the 170-1 75 A bandpass. This image was recorded on board a sounding-rocket experiment flown on 1994 November 3, called the Multi-Spectral Solar Telescope Array II (MSSTA II). MSSTA, a joint project of Stanford University, the NASA Marshall Space Flight Center, and the Lawrence Livermore National Laboratory' is an observing platform composed of a set of normal-incidence, multilayer-coated optics designed to obtain narrow-bandpass, high-resolution images (1 sec.- 3 sec.) at selected far-ultraviolet (FUV), extreme-ultraviolet (EUV), and soft X-ray wavelengths (44-1550 A). Using full disk images centered at 1550 A (C IV) and 173 A (Fe IX/X), the funnel model, which is based on coronal back-heating, was tested against the data incorporating observed constraints on global coverage and measured flux. Found was a class of funnel models that could account for the quiescent, globally diffuse and unresolved emission seen in the 171-175 A bandpass, where the funnels are assumed to be rooted in the C IV supergranular network. These models, when incorporated with the CHIANTI spectral code, suggest that this emission is mostly of upper transition region origin and primarily composed of Fe IX plasma. The funnels are found to have constrictions, Gamma approx. 6-20, which is in good agreement with the observations. Further, the fitted models simultaneously satisfy global areal constraints seen in both images; namely,that a global network of funnels must cover approx. 700 - 95% of the total solar surface area seen in the 171-175 A image, and a 5% of the disk area seen in the 1550 A bandpass. These findings support the configuration of the EUV magnetic network as suggested by Reeves et al. and put forth in more detail by Gabriel. Furthermore, the models are in good agreement with differential emission measure estimates made of the transition region by J. C. Raymond & J. G

  3. EFFECTS OF ULTRAVIOLET RADIATION ON THE MODERATE HALOPHILE HALOMONAS ELONGATA AND THE EXTREME HALOPHILE HALOBACTERIUM SALINARUM

    EPA Science Inventory

    Both the moderately halophilic bacterium, Halomonas elongata, and the extremely halophilic archaea, Halobacterium salinarum, can be found in hypersaline environments (e.g., salterns). On complex media, H. elongata grows over a salt range of 0.05-5.2 M, whereas, H. salinarum multi...

  4. Reply to ``Comment on `Ultrafast Demagnetization Measurements Using Extreme Ultraviolet Light: Comparison of Electronic and Magnetic Contributions' ''

    NASA Astrophysics Data System (ADS)

    Turgut, Emrah; Grychtol, Patrik; La-O-Vorakiat, Chan; Adams, Daniel E.; Kapteyn, Henry C.; Murnane, Margaret M.; Mathias, Stefan; Aeschlimann, Martin; Schneider, Claus M.; Shaw, Justin M.; Nembach, Hans T.; Silva, Thomas J.

    2013-07-01

    The Comment of Vodungbo et al. recognizes that a unique determination of the refractive-index variation over time is not possible using the data set in our paper, “Ultrafast Demagnetization Measurements Using Extreme Ultraviolet Light: Comparison of Electronic and Magnetic Contributions.” Furthermore, it was suggested that the lack of uniqueness allows for the possibility of a very specific time-dependent trajectory of the refractive index in the complex plane that could give rise to a large nonmagnetic modulation of the measured asymmetry, in spite of a negligible change in the s-polarized reflectivity. In this Reply, we conclusively show that any nonmagnetic contribution to the measured asymmetry is indeed negligible (<2%), below the noise level of the magnetic-asymmetry measurements. First, we use a few additional measurements to unambiguously rule out the presence of any nonmagnetic contributions to the signal. Second, we show that the scenario proposed by Vodungbo et al. would require both exotic time and energy dependences of the refractive index near the M edge that are extremely unlikely (virtually impossible) in real materials. Thus, the conclusions of our original article are preserved.

  5. Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

    NASA Astrophysics Data System (ADS)

    Cummings, Kevin; Ashworth, Dominic; Bremer, Mark; Chin, Rodney; Fan, Yu-Jen; Girard, Luc; Glatzel, Holger; Goldstein, Michael; Gullikson, Eric; Kennon, Jim; Kestner, Bob; Marchetti, Lou; Naulleau, Patrick; Soufli, Regina; Bauer, Johannes; Mengel, Markus; Welker, Joachim; Grupp, Michael; Sohmen, Erik; Wurm, Stefan

    2014-04-01

    In support of the Extreme Ultraviolet Lithography (EUVL) roadmap, a SEMATECH/CNSE joint program is underway to produce multiple EUVL (wavelength of 13.5 nm) R&D photolithography tools. The 0.5 NA projection optic magnification (5X), track length and mechanical interfaces match the currently installed 0.3 NA micro-field exposure tools (MET) projection optic [1] [2] [3]. Therefore, significant changes to the current tool platforms and other adjacent modules are not necessary. However, many of the existing systems do need upgrades to achieve the anticipated smaller exposure feature sizes [4]. To date we have made considerable progress in the production of the first of the two-mirror 0.5 NA projection optics for EUVL [5]. With a measured transmitted wave front error of less than 1 nm root mean square (RMS) over its 30 μm × 200 μm image field, lithography modeling shows that a predicted resolution of <=12 nm and an ultimate resolution of 8 nm (with extreme dipole illumination) will be possible. This paper will present an update from the 0.5 NA EUVL program. We will detail the more significant activities that are being undertaken to upgrade the MET and discuss expected performance.

  6. First results of measurements of extreme ultraviolet radiation onboard a geostationary satellite "ELECTRO-L"

    NASA Astrophysics Data System (ADS)

    Nusinov, Anatoliy; Kazachevskaya, Tamara; Gonjukh, David

    Measurements of the intensity of EUV emission in the hydrogen Lyman-alpha line were conducted by a broadband photometer VUSS-E onboard geostationary Hydrometeorological satellite "Electro" since March 2011. The solar hydrogen Lyman-alpha line (lambda = 121.6 nm) was monitored. The photomultiplier with LiF window used as a detector insensitive to visible light. Long-wavelength limit of the spectral band sensitivity of the instrument is about 200 nm, so the signal of the device is defined as the flux of solar radiation in the region of 123-200 nm. Its exclusion was carried out by calculation. Since the satellite "Electro" designed for remote sensing of the Earth, its line of sight focused on Earth. Alignment of instrument in the Sun direction was achieved by installing it on the solar panel, periodically moved in the solar direction. Correction of instrument readings, reduced due to the deviation of its axis from the Sun direction, carried out by calculation. Measurements were carried out every second. The first results of the measurements are presented. The difference in absolute calibration Electro-L/VUSS-E is within 5% of corresponding values for measurements TIMED satellite in those days, that is in agreement with laboratory calibrations. It is useful to measure the temperature of the instrument, as its variation on a small interval of time makes change the value of the output signal about 1-2 %. During first year of operation, the sensitivity of the apparatus remained within ± 2% of measured value, significant degradation of sensitivity was not observed. Over time of observation there have been several large flares of X class. The increase of the signal in the ultraviolet range does not exceed a few percent during these flares.

  7. Attosecond streaking measurement of extreme ultraviolet pulses using a long-wavelength electric field

    PubMed Central

    Saito, Nariyuki; Ishii, Nobuhisa; Kanai, Teruto; Watanabe, Shuntaro; Itatani, Jiro

    2016-01-01

    Long-wavelength lasers have great potential to become a new-generation drive laser for tabletop coherent light sources in the soft X-ray region. Because of the significantly low conversion efficiency from a long-wavelength light field to high-order harmonics, their pulse characterization has been carried out by measuring the carrier-envelope phase and/or spatial dependences of high harmonic spectra. However, these photon detection schemes, in general, have difficulty in obtaining information on the spectral phases, which is crucial to determine the temporal structures of high-order harmonics. Here, we report the first attosecond streaking measurement of high harmonics generated by few-cycle optical pulses at 1.7 μm from a BiB3O6–based optical parametric chirped-pulse amplifier. This is also the first demonstration of time-resolved photoelectron spectroscopy using high harmonics from a long-wavelength drive laser other than Ti:sapphire lasers, which paves the way towards ultrafast soft X-ray photoelectron spectroscopy. PMID:27752115

  8. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOEpatents

    Kublak, Glenn D.; Richardson, Martin C. (CREOL

    1996-01-01

    Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

  9. Study of the large-scale structure of the plasmasphere using extreme ultraviolet observations

    SciTech Connect

    Chakrabarti, S.

    1982-01-01

    Plasmaspheric ion distributions in the 500-30,000 km range have been indirectly measured by observing selected lines of solar Extreme Ultra Violet spectrum resonantly scattered by different ionic species. The observations were made with a broad-band photometer on the Apollo-Soyuz mission and an EUV spectrometer on board the STP78-1 satellite. A third experiment has been conducted recently from rocket-borne photometers. The data obtained from these experiments were compared against several theoretical models of ion distributions. The study shows that the ad-hoc models, which were sufficient to explain previous observations, were unable to explain the data obtained by the instruments which were more sensitive than the previous ones. A kinetic equilibrium model of ion distribution, which takes the effect of a non-homogeneous magnetic field into account, was found to explain the observations. The model uses a reference ionosphere and a thermal structure of the plasmasphere as the input parameters. The ion density at the reference ionosphere (500 km) used in this analysis was obtained from simultaneous measurements by a mass spectrometer on the Atmospheric Explorer satellite. Ion temperature at the reference altitude was obtained from near-simultaneous measurements by a retarding potential analyzer on the same satellite. This use of independent measurements to restrict the boundary values enhances the validity of the model.

  10. Six years in orbit: the MCP detectors aboard the Extreme Ultraviolet Explorer Satellite

    NASA Astrophysics Data System (ADS)

    Vallerga, John V.; Roberts, Bryce; Dupuis, Jean; Jelinsky, Patrick N.

    1998-08-01

    The Extreme UV Explorer satellite (EUVE) was launched on June 7, 1992 with seven microchannel plate detectors behind four telescopes. All seven detectors have been operating continuously since then, cycling the high voltage bias to half voltage during the daylight portions of the orbit as well as during passage through the South Atlantic Anomaly. This paper will present the time history of the detector performance characteristics, including spatial and spectral response, gain, and flat fields. We will also discuss our experiences with the thin-film filters used to define the detector EUV bandpasses including spatial and spectral response, gain, and flat fields. We will also discuss our experiences with the thin-film filters used to define the detector EUV bandpasses including the development of 'micro' pinholes in the Al/Ti/C filters. We then illustrate specific examples of detector problems and their solutions, such as 'dithering' the spacecraft pointing to average out the small scale image distortions and off-axis pointing to avoid an on-axis 'deadspot'.

  11. Absolute sensitivity calibration of vacuum and extreme ultraviolet spectrometer systems and Z{sub eff} measurement based on bremsstrahlung continuum in HL-2A tokamak

    SciTech Connect

    Zhou Hangyu; Cui Zhengying; Fu Bingzhong; Sun Ping; Gao Yadong; Xu Yuan; Lu Ping; Yang Qingwei; Duan Xuru; Morita, Shigeru; Goto, Motoshi; Dong Chunfeng

    2012-10-15

    A grazing-incidence flat-field extreme ultraviolet (EUV) spectrometer has been newly developed in HL-2A tokamak. Typical spectral lines are observed from intrinsic impurities of carbon, oxygen, iron, and extrinsic impurity of helium in the wavelength range of 20 A-500 A. Bremsstrahlung continuum is measured at different electron densities of HL-2A discharges to calibrate absolute sensitivity of the EUV spectrometer system and to measure effective ionic charge, Z{sub eff}. The sensitivity of a vacuum ultraviolet (VUV) spectrometer system is also absolutely calibrated in overlapped wavelength range of 300 A-500 A by comparing the intensity between VUV and EUV line emissions.

  12. Generation of 1.5 W average power, 18 kHz repetition rate coherent mid-ultraviolet radiation at 271.2 nm.

    PubMed

    Biswal, Ramakanta; Agrawal, Praveen K; Dixit, Sudhir K; Nakhe, Shankar V

    2015-11-10

    This paper presents to our knowledge a first time study on the generation of 1.5 W average power, 18 kHz repetition rate coherent mid-ultraviolet (UV) radiation at 271.2 nm. The work is based on frequency summing of coherent green (G: 510.6 nm) and yellow (Y: 578.2 nm) radiations of a copper-HBr laser in a β-barium borate crystal. Average and peak sum frequency conversion efficiencies of about 13% and 16%, respectively, are obtained. The sum frequency results are experimentally analyzed in terms of the extent of matching of green and yellow pump radiations in space, time, and frequency domains. The result is of high significance for many applications in photonics components fabrication, semiconductor technology, and spectroscopy. PMID:26560794

  13. Investigating the Effects of Simulated Martian Ultraviolet Radiation on Halococcus dombrowskii and Other Extremely Halophilic Archaebacteria

    NASA Astrophysics Data System (ADS)

    Fendrihan, Sergiu; Bérces, Attila; Lammer, Helmut; Musso, Maurizio; Rontó, György; Polacsek, Tatjana K.; Holzinger, Anita; Kolb, Christoph; Stan-Lotter, Helga

    2009-02-01

    The isolation of viable extremely halophilic archaea from 250-million-year-old rock salt suggests the possibility of their long-term survival under desiccation. Since halite has been found on Mars and in meteorites, haloarchaeal survival of martian surface conditions is being explored. Halococcus dombrowskii H4 DSM 14522T was exposed to UV doses over a wavelength range of 200-400 nm to simulate martian UV flux. Cells embedded in a thin layer of laboratory-grown halite were found to accumulate preferentially within fluid inclusions. Survival was assessed by staining with the LIVE/DEAD kit dyes, determining colony-forming units, and using growth tests. Halite-embedded cells showed no loss of viability after exposure to about 21 kJ/m2, and they resumed growth in liquid medium with lag phases of 12 days or more after exposure up to 148 kJ/m2. The estimated D37 (dose of 37% survival) for Hcc. dombrowskii was ≥ 400 kJ/m2. However, exposure of cells to UV flux while in liquid culture reduced D37 by 2 orders of magnitude (to about 1 kJ/m2); similar results were obtained with Halobacterium salinarum NRC-1 and Haloarcula japonica. The absorption of incoming light of shorter wavelength by color centers resulting from defects in the halite crystal structure likely contributed to these results. Under natural conditions, haloarchaeal cells become embedded in salt upon evaporation; therefore, dispersal of potential microscopic life within small crystals, perhaps in dust, on the surface of Mars could resist damage by UV radiation.

  14. Investigating the Effects of Simulated Martian Ultraviolet Radiation on Halococcus dombrowskii and Other Extremely Halophilic Archaebacteria

    PubMed Central

    Fendrihan, Sergiu; Bérces, Attila; Lammer, Helmut; Musso, Maurizio; Rontó, György; Polacsek, Tatjana K.; Holzinger, Anita; Kolb, Christoph; Stan-Lotter, Helga

    2011-01-01

    The isolation of viable extremely halophilic archaea from 250-million-year-old rock salt suggests the possibility of their long-term survival under desiccation. Since halite has been found on Mars and in meteorites, haloarchaeal survival of martian surface conditions is being explored. Halococcus dombrowskii H4 DSM 14522T was exposed to UV doses over a wavelength range of 200–400 nm to simulate martian UV flux. Cells embedded in a thin layer of laboratory-grown halite were found to accumulate preferentially within fluid inclusions. Survival was assessed by staining with the LIVE/DEAD kit dyes, determining colony-forming units, and using growth tests. Halite-embedded cells showed no loss of viability after exposure to about 21 kJ/m2, and they resumed growth in liquid medium with lag phases of 12 days or more after exposure up to 148 kJ/m2. The estimated D37 (dose of 37 % survival) for Hcc. dombrowskii was ≥ 400 kJ/m2. However, exposure of cells to UV flux while in liquid culture reduced D37 by 2 orders of magnitude (to about 1 kJ/m2); similar results were obtained with Halobacterium salinarum NRC-1 and Haloarcula japonica. The absorption of incoming light of shorter wavelength by color centers resulting from defects in the halite crystal structure likely contributed to these results. Under natural conditions, haloarchaeal cells become embedded in salt upon evaporation; therefore, dispersal of potential microscopic life within small crystals, perhaps in dust, on the surface of Mars could resist damage by UV radiation. PMID:19215203

  15. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    NASA Astrophysics Data System (ADS)

    Plogmaker, S.; Terschlüsen, J. A.; Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J.

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ṡ 1010 photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  16. Alternate charging profiles for the onboard nickel cadmium batteries of the Explorer Platform/Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Rao, Gopalakrishna M.; Prettyman-Lukoschek, Jill S.

    1995-01-01

    The Explorer Platform/Extreme Ultraviolet Explorer (EP/EUVE) spacecraft power is provided by the Modular Power Subsystems (MPS) which contains three 50 ampere-hour Nickel Cadmium (NiCd) batteries. The batteries were fabricated by McDonnell Douglas Electronics Systems Company, with the cells fabricated by Gates Aerospace Batteries (GAB), Gainesville, Florida. Shortly following launch, the battery performance characteristics showed similar signatures as the anomalous performance observed on both the Upper Atmosphere Research Satellite (UARS) and the Compton Gamma Ray Observatory (CGRO). This prompted the development and implementation of alternate charging profiles to optimize the spacecraft battery performance. The Flight Operations Team (FOT), under the direction of Goddard Space Flight Center's (GSFC) EP/EUVE Project and Space Power Applications Branch have monitored and managed battery performance through control of the battery Charge to Discharge (C/D) ratio and implementation of a Solar Array (SA) offset. This paper provides a brief overview of the EP/EUVE mission, the MPS, the FOT's battery management for achieving the alternate charging profile, and the observed spacecraft battery performance.

  17. Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

    SciTech Connect

    Park, Y. R.; Ahn, J. H.; Kim, J. S.; Kwon, B. S.; Lee, N.-E.; Kang, H. Y.; Hwangbo, C. K.; Ahn, Jinho; Seo, Hwan Seok

    2010-07-15

    Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics with a completely different configuration than those of conventional photolithography. This study investigated the etching properties of indium tin oxide (ITO) binary mask materials for EUVL, such as ITO (absorber layer), Ru (capping/etch-stop layer), and a Mo-Si multilayer (reflective layer), by varying the Cl{sub 2}/Ar gas flow ratio, dc self-bias voltage (V{sub dc}), and etch time in inductively coupled plasmas. The ITO absorber layer needs to be etched with no loss in the Ru layer on the Mo-Si multilayer for fabrication of the EUVL ITO binary mask structure proposed here. The ITO layer could be etched with an infinitely high etch selectivity over the Ru etch-stop layer in Cl{sub 2}/Ar plasma even with a very high overetch time.

  18. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    SciTech Connect

    Plogmaker, S. E-mail: Joachim.Terschluesen@physics.uu.se Terschlüsen, J. A. E-mail: Joachim.Terschluesen@physics.uu.se Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J. E-mail: Joachim.Terschluesen@physics.uu.se

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  19. Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Hatakeyama, Masahiro; Terao, Kenji; Watanabe, Hidehiro

    2016-04-01

    Extreme ultraviolet lithography (EUVL) patterned mask defect detection is a major issue that must be addressed to realize EUVL-based device fabrication. We have designed projection electron microscope (PEM) optics for integration into a mask inspection system, and the resulting PEM system performs well in half-pitch (hp) 16-nm-node EUVL patterned mask inspection applications. A learning system has been used in this PEM patterned mask inspection tool. The PEM identifies defects using the "defectivity" parameter that is derived from the acquired image characteristics. The learning system has been developed to reduce the labor and the costs associated with adjustment of the PEM's detection capabilities to cope with newly defined mask defects. The concepts behind this learning system and the parameter optimization flow are presented here. The learning system for the PEM is based on a library of registered defects. The learning system then optimizes the detection capability by reconciling previously registered defects with newly registered defects. Functional verification of the learning system is also described, and the system's detection capability is demonstrated by applying it to the inspection of hp 11-nm EUV masks. We can thus provide a user-friendly mask inspection system with reduced cost of ownership.

  20. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Takei, Satoshi; Oshima, Akihiro; Oyama, Tomoko G.; Ito, Kenta; Sugahara, Kigen; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi; Hanabata, Makoto

    2014-11-01

    The application of natural linear polysaccharide to green resist polymers was demonstrated for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free water spin-coating and tetramethylammonium hydroxide (TMAH)-free water-developable techniques. The water spin-coating and water-developable processes in a green resist material were carried out on wafers because of the water solubility of natural polysaccharides for an environmentally friendly manufacturing process for next-generation electronic devices. The developed green resist material with a weight-average molecular weight of 83,000 and 70 mol % hydroxyl groups as a water-developable feature was found to have acceptable properties such as spin-coat ability on 200 mm wafers, prediction sensitivity to EUV at the wavelengths of 6.7 and 13.5 nm, a high contrast of the water dissolution rate before and after EB irradiation, pillar patterns of 100-400 nm with a high EB sensitivity of 10 µC/cm2, and etch selectivity with a silicon-based middle layer in CF4 plasma treatment.