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Sample records for doped gaas schottky

  1. The influence of a doping profile on the characteristics of an ion-implanted GaAs field-effect transistor with a Schottky barrier

    SciTech Connect

    Shestakov, A. K. Zhuravlev, K. S.

    2011-12-15

    A GaAs field-effect ion-implanted transistor with a Schottky barrier is simulated. The doping profile obtained when doping through an insulator mask is determined and the dependences of the static transistor characteristics on the parameters of the doping profile are calculated and analyzed. The physical processes controlling the transistor characteristics in the case of a variation in the parameters of its doping profile and the coefficient of compensation of the substrate are studied. Based on calculations, the optimal doping-profile parameters ensuring the best characteristics for transistors are predicted.

  2. Deep traps and temperature effects on the capacitance of p-type Si-doped GaAs Schottky diodes on (2 1 1) and (3 1 1) oriented GaAs substrates

    NASA Astrophysics Data System (ADS)

    Boumaraf, R.; Sengouga, N.; Mari, R. H.; Meftah, Af.; Aziz, M.; Jameel, Dler; Al Saqri, Noor; Taylor, D.; Henini, M.

    2014-01-01

    The SILVACO-TCAD numerical simulator is used to explain the effect of different types of deep levels on the temperature dependence of the capacitance of p-type Si-doped GaAs Schottky diodes grown on high index GaAs substrates, namely (3 1 1)A and (2 1 1)A oriented GaAs substrates. For the (3 1 1)A diodes, the measured capacitance-temperature characteristics at different reverse biases show a large peak while the (2 1 1)A devices display a much smaller one. This peak is related to the presence of different types of deep levels in the two structures. These deep levels are characterized by the Deep Level Transient Spectroscopy (DLTS) technique. In the (3 1 1)A structure only majority deep levels (hole deep levels) were observed while both majority and minority deep levels were present in the (2 1 1)A diodes. The simulation software, which calculates the capacitance-voltage and the capacitance-temperature characteristics in the absence and presence of different types of deep levels, agrees well with the experimentally observed behavior of the capacitance-temperature properties. A further evidence to confirm that deep levels are responsible for the observed phenomenon is provided by a simulation of the capacitance-temperature characteristics as a function of the ac-signal frequency.

  3. Investigation of Schottky Barrier on GaAs and InP Using a Multi-Disciplined Approach

    DTIC Science & Technology

    1990-10-29

    more optimum metal contacts and Schottky barriers on GaAs and for increasing productivity and reliability of monolithic as well as individual GaAs...Since this overall study was motivated by a desire to understand GaAs (as well as InP and other 3-5) interfaces on an atomic level , we recognized...properly manipulating the native defects and impurity doping near the interface. This is supported by results of studies by others as well as

  4. Carbon doping of GaAs NWs

    NASA Astrophysics Data System (ADS)

    Salehzadeh Einabad, Omid

    Nanowires (NWs) have been proposed and demonstrated as the building blocks for nanoscale electronic and photonic devices such as NW field effect transistors and NW solar cells which rely on doping and trap-free carrier transport. Controlled doping of NWs and a high degree of structure and morphology control are required for device applications. However, doping of III-V nanowires such as GaAs nanowires has not been reported extensively in the literature. Carbon is a well known p-type dopant in planar GaAs due to its low diffusivity and high solubility in bulk GaAs; however its use as an intentional dopant in NW growth has not yet been investigated. In this work we studied the carbon doping of GaAs nanowires using CBr4 as the dopant source. Gold nanoparticles (NP) at the tip ofthe NWs have been used to drive the NW growth. We show that carbon doping suppresses the migration ofthe gold NPs from the tip of the NWs. In addition, we show that the carbon doping of GaAs NWs is accompanied by an increase of the axial growth rate and decrease of the lateral growth rate ofthe NWs. Carbon-doped GaAs NWs, unlike the undoped ones which are highly tapered, are rod-like. The origin of the observed morphological changes is attributed to the carbon adsorbates on the sidewalls ofthe nanowires which suppress the lateral growth of the nanowires and increase the diffusion length of the gallium adatoms on the sidewalls. Stacking fault formation consisting of alternating regIOns of zincblende and wurtzite structures has been commonly observed in NWs grown along the (111) direction. In this work, based on transmission electron microscopy (TEM) analysis, we show that carbon doping ofGaAs NWs eliminates the stacking fault formation. Raman spectroscopy was used to investigate the effects of carbon doping on the vibrational properties of the carbon-doped GaAs nanowires. Carbon doping shows a strong impact on the intrinsic longitudinal and transverse optical (La and TO) modes of the GaAs

  5. Photoluminescence of Mn+ doped GaAs

    NASA Astrophysics Data System (ADS)

    Zhou, Huiying; Qu, Shengchun; Liao, Shuzhi; Zhang, Fasheng; Liu, Junpeng; Wang, Zhanguo

    2010-10-01

    Photoluminescence is one of the most useful techniques to obtain information about optoelectronic properties and defect structures of materials. In this work, the room-temperature and low temperature photoluminescence of Mn-doped GaAs were investigated, respectively. Mn-doped GaAs structure materials were prepared by Mn+ ion implantation at room temperature into GaAs. The implanted samples were subsequently annealed at various temperatures under N2 atmosphere to recrystallize the samples and remove implant damage. A strong peak was found for the sample annealed at 950 °C for 5 s. Transitions near 0.989 eV (1254 nm), 1.155 eV (1074 nm) and 1.329 eV (933 nm) were identified and formation of these emissions was analyzed for all prepared samples. This structure material could have myriad applications, including information storage, magnet-optical properties and energy level engineering.

  6. Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier

    DOEpatents

    Carlson, David E.; Wronski, Christopher R.

    1979-01-01

    A Schottky barrier amorphous silicon solar cell incorporating a thin highly doped p-type region of hydrogenated amorphous silicon disposed between a Schottky barrier high work function metal and the intrinsic region of hydrogenated amorphous silicon wherein said high work function metal and said thin highly doped p-type region forms a surface barrier junction with the intrinsic amorphous silicon layer. The thickness and concentration of p-type dopants in said p-type region are selected so that said p-type region is fully ionized by the Schottky barrier high work function metal. The thin highly doped p-type region has been found to increase the open circuit voltage and current of the photovoltaic device.

  7. Reduction of Schottky Reverse Leakage Current Using GaAs Surface Cleaning with UVO3 Treatment

    NASA Astrophysics Data System (ADS)

    Tanimoto, Takuma; Ohbu, Isao; Ohta, Hiroshi; Takatani, Shinichiro

    1999-07-01

    A GaAs surface-cleaning method using UVO3 treatment was developed. The UVO3 treatment involves two processes: GaAs surface oxidation and oxide removal. Surface oxidation is performed by using a mercury lamp at high temperature, such as 180°C. GaAs oxide is removed by NH4OH solution dipping. Spectroscopic ellipsometry and X-ray photoelectron spectroscopy (XPS) study showed that thermally unstable As oxides exist on a non-treated surface; however, surface GaAs oxides are almost completely removed by this treatment. This cleaning method was applied in the field effect transistor (FET)-gate-formation process and, consequently, Schottky leakage current was significantly reduced.

  8. Interfacial microstructure of tungsten silicide Schottky contacts to n-type GaAs

    SciTech Connect

    Shih, Y.; Callegari, A.; Murakami, M.; Wilkie, E.L.; Hovel, H.J.; Parks, C.C.; Childs, K.D.

    1988-08-15

    To investigate the effects of microstructure of the Schottky characteristics of WSi/sub x/ contacts to n-type GaAs, cross-sectional transmission electron microscopy, x-ray diffraction, and secondary-ion mass spectrometry have been used to study the interfacial and bulk film microstructures. The barrier heights and ideality factors of WSi/sub 0.1/ and WSi/sub 0.6/ contacts were obtained by forward current-voltage and capacitance-voltage measurements. These Schottky characteristics were found to be unrelated to the bulk film microstructure, but closely related to the interfacial microstructure at the WSi/sub x//GaAs interfaces. Both the WSi/sub 0.1//GaAs and WSi/sub 0.6//GaAs interface morphologies were observed to be stable and remain smooth during annealing at 800 /sup 0/C for 10 min, while a rough interface with W protrusions and Ga and As out-diffusion was observed in two-layer W/WSi/sub 0.6/ contacts. The stability of the WSi/sub x/ interfacial microstructure is suggested to depend on both the chemical stability of the WSi/sub x/ films with GaAs and the intervening oxides between WSi/sub x/ and GaAs. Nontrivial amounts of W and Si were observed to diffuse from the WSi/sub 0.1/ film into the GaAs substrate during annealing at 800 /sup 0/C for 10 min. Although these in-diffused impurities in the GaAs substrate do not seem to affect the Schottky characteristics after the 800 /sup 0/C annealing, they could be a potential problem in long-term stability. Of the three WSi/sub x/ film compositions, the single-layer WSi/sub 0.6/ films were found to have the least W and Si in-diffusion and thus the best thermal stability.

  9. Circuit Compatible Model for Electrostatic Doped Schottky Barrier CNTFET

    NASA Astrophysics Data System (ADS)

    Singh, Amandeep; Khosla, Mamta; Raj, Balwinder

    2016-10-01

    This paper proposes a circuit compatible model for electrostatic doped Schottky barrier carbon nanotube field effect transistor (ED-SBCNTFET). The proposed model is an extension of the Schottky barrier carbon nanotube field effect transistor (SBCNTFET) to ED-SBCNTFET by adding polarity gates, which are used to create electrostatic doping. In ED-SBCNTFET, electrostatic doping is responsible for a fermi level shift of source and drain regions. A mathematical relation has been developed between fermi level shift and polarity gate bias. Both current-voltage ( I- V) and capacitance-voltage ( C- V) characteristics have been efficiently modeled. The results are compared with the reported semi-classical model and simulations from NanoTCAD ViDES for validation. The proposed model is much faster than numerical models as it denies self consistent equations. Finally, circuit application is demonstrated by simulating inverter using the proposed model in HSPICE.

  10. Au and Al Schottky barrier formation on GaAs (100) surfaces prepared by thermal desorption of a protective arsenic coating

    SciTech Connect

    Spindt, C.J.; Yamada, M.; Meissner, P.L.; Miyano, K.E.; Herrera, A.; Spicer, W.E. . Stanford Electronics Labs.); Arko, A.J. ); Woodall, J.M.; Pettit, G.D. . Thomas J. Watson Research Center)

    1991-01-01

    Photoelectron spectroscopy has been used as a tool to investigate the initial stages of Schottky barrier formation on GaAs (100) surfaces. This is a popular technique that has been used by many researchers in the past to measure the band bending (or shift) of the valence band and conduction band (a measure of the Schottky barrier shift), while the Fermi level remains fixed at the system ground (i.e., the ground of the spectrometer). Metal deposition on a semiconductor surface can alter the Schottky barrier at the surface and pin the Fermi level near the middle of the energy gap. Extremely clean and crystallographically perfect surfaces are required in this study. Toward this end, a method of protecting the GaAs surface was employed which consists of capping the GaAs surface with a layer of As. Upon introduction into the high vacuum system the As is thermally desorbed, revealing a pure GaAs surface. Our work was motivated by a previous study (Brillson et al) on similarly capped specimens, which suggested that metal overlayers do not pin the Schottky barrier in GaAs. Barrier heights varied by as much as 0.75 eV between Al and Au overlayers. This large energy range is a striking result in view of the fact that a considerable number of prior studies on both (110) and (100) surfaces have found that all metals will pin within a narrow (0.25 eV) range at midgap. We repeated the measurements of Brillson on the identically doped samples used in their study using two extreme range metals of Au and Al as overlayers. We found that the barrier height measurements on low doped n-type samples used in this work and in the previous work are affected by photovoltaic effects, even at room temperature. This was determined from taking spectra at a number of temperatures between 20 K and room temperature and looking for shifts. 16 refs., 7 figs.

  11. GaAs detectors with an ultra-thin Schottky contact for spectrometry of charged particles

    NASA Astrophysics Data System (ADS)

    Chernykh, S. V.; Chernykh, A. V.; Didenko, S. I.; Baryshnikov, F. M.; Burtebayev, N.; Britvich, G. I.; Chubenko, A. P.; Guly, V. G.; Glybin, Yu. N.; Zholdybayev, T. K.; Burtebayeva, J. T.; Nassurlla, M.

    2017-02-01

    For the first time, samples of particle detectors based on high-purity GaAs epilayers with an active area of 25 and 80 mm2 and an ultra-thin Pt Schottky barrier were fabricated for use in the spectrometry of charged particles and their operating characteristics were studied. The obtained FWHM of 14.2 (for 25 mm2 detector) and 15.5 keV (for 80 mm2 detector) on the 5.499 MeV line of 238Pu is at the level of silicon spectrometric detectors. It was found that the main component that determines the energy resolution of the detector is a fluctuation in the number of collected electron-hole pairs. This allows us to state that the obtained energy resolution is close to the limit for VPE GaAs.

  12. GaAs MESFET with lateral non-uniform doping

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.

    1983-01-01

    An analytical model of the GaAs MESFET with arbitrary non-uniform doping is presented. Numerical results for linear lateral doping profile are given as a special case. Theoretical considerations predict that better device linearity and improved F(T) can be obtained by using linear lateral doping when doping density increases from source to drain.

  13. Drain current drift by holes trapped in Schottky contact in WSi gate GaAs MESFeTs

    SciTech Connect

    Shiga, T.; Hattori, R.; Kunii, T.

    1995-12-31

    Hysteretic drain current (Id) drift phenomena observed in the high power operation of WSi gate GaAs MESFETs were studied. The existence of a thin insulating layer at WSi/GaAs interface originated by the native oxide on GaAs surface was revealed by XPS and X-ray reflection. Id drift phenomena can be explained as the effect of holes being trapped in the insulating layer at the WSi/GaAs Schottky contact interface.

  14. A performance optimization and analysis of graphene based schottky barrier GaAs solar cell

    NASA Astrophysics Data System (ADS)

    Jolson Singh, Khomdram; Chettri, Dhanu; Jayenta Singh, Thokchom; Thingujam, Terirama; Sarkar, Subir kumar

    2017-06-01

    Performance optimization of Graphene-GaAs schottky barrier solar cell have been performed by considering variables such as substrate thickness, Graphene thickness, dependence between graphene work function and transmittance. The optimized parameter was extensively used to numerically model the design using TCAD Atlas. The results show the enhanced performance of the design with the optimized thickness of Graphene (0.3μm) and GaAs (10μm), resulting in significant increase in power conversion efficiency from 0.732% to 2.581% and reasonable fill factor up to 70%. It was further analysed that maximum potential was developed in the vicinity of the anode, which results in better charge collection hence improving the overall performance of the solar cell. The results are validated with the reported experimental work.

  15. Large area, low capacitance, GaAs nanowire photodetector with a transparent Schottky collecting junction

    SciTech Connect

    Seyedi, M. A. Yao, M.; O'Brien, J.; Dapkus, P. D.; Wang, S. Y.

    2013-12-16

    We present experimental results on a GaAs/Indium-Tin-Oxide Schottky-like heterojunction photodetector based on a nanowire device geometry. By distributing the active detecting area over an array of nanowires, it is possible to achieve large area detection with low capacitance. Devices with bare GaAs and passivated AlGaAs/GaAs nanowires are fabricated to compare the responsivity with and without surface passivation. We are able to achieve responsivity of >0.5A/W and Signal-Noise-Ratio in excess of 7 dB for 2 V applied reverse bias with passivated nanowire devices. Capacitance-voltage measurement yields <5 nF/cm{sup 2}, which shows a strong possibility for high-speed applications with a broad area device.

  16. Hole Injection from Schottky Gate in Ion-Implanted GaAs Integrated Circuits

    NASA Astrophysics Data System (ADS)

    Shulman, Dima D.; Young, Lawrence

    1992-05-01

    Measurements of currents for a GaAs metal-semiconductor field-effect transistor (MESFET) when a negative bias was applied to a nearby ohmic contact (sidegate) showed that significant hole injection from the gate occurs for large negative sidegate voltages. This is in agreement with a proposed model, in which the presence of an inversion layer under the Schottky gate due to the pinning of the Fermi level at the channel surface causes hole injection into the channel when the gate is positively biased with respect to the sidegate. Upon increasing negative sidegate voltage the substrate-channel depletion region is expanded, and consequently, the neutral region of the channel is shrunk. This results in more holes being injected into the substrate from the gate.

  17. Interface states of Ag/(110)GaAs Schottky diodes without and with interfacial layers

    SciTech Connect

    Platen, W.; Schmutzler, H.; Kohl, D.; Brauchle, K.; Wolter, K.

    1988-07-01

    GaAs(110) faces with different preparations: ultrahigh vacuum (UHV) cleaved, polished and etched, polished and sputtered: are prepared as Schottky diodes by the deposition of Ag. Diodes based on UHV-cleaved faces do show homogeneously distributed EL2 and EL5 states in deep level transient spectroscopy (DLTS). On polished and etched samples an additional interface state (IS) distribution with a density of 9 x 10/sup 11/ eV/sup -1/ cm/sup -2/ at the DLTS maximum appears. These states can be caused by defects at the oxidic interfacial layer. Polishing and sputtering also evokes the IS distribution. The absence of a DLTS signal from metal-induced gap states (MIGS) which pin the Fermi level at 0.49 eV above the valence-band maximum is related to the absence of an interfacial layer in the UHV prepared Schottky diodes. The sputter process increases the electron density in a thin layer below the interface by an As excess. The corresponding smaller extent of the barrier causes an additional electron emission via tunneling processes from the IS distribution. Furthermore, a near-interface state, EL6 (V/sub Ga/-V/sub As/), shows up. Its concentration at the interface attains N/sub EL6/ = 2.5 x 10/sup 16/ cm/sup -3/ comparable to the shallow donor concentration.

  18. DC- and IF-noise performance optimization of GaAs Schottky diodes for THz applications

    NASA Astrophysics Data System (ADS)

    Cojocari, O.; Biber, S.; Mottet, B.; Rodriguez-Girones, M.; Hartnagel, H. L.; Schmidt, L.-P.

    2005-01-01

    This paper presents results which originated from a long-term systematic optimization of surface processing prior to anode formation of THz Schottky-based components. Particularly, four most promising surface-processing approaches are carefully investigated separately and in combination in order to understand the chemical and physical processes occurring on a GaAs surface. A reliable technological approach for anode formation is identified, which exhibits optimal diode characteristics and production repeatability. A model is proposed for the influence of each process on the subsequent one in the fabrication process sequence. DC- and IF-noise measurements are performed using an automated measurement system providing statistically significant data. Very good dc-parameters such as a series resistance of Rs = 15 Ω, an ideality factor N = 1.168, a reverse current Is = 0.024 fA and an IF-noise temperature of 257 K at 1 mA current bias with a good uniformity are achieved for non-cooled Schottky diodes with an anode diameter of 1 µm. The best noise figure is measured to be as low as 220 K at 3.8 GHz and 1 mA current bias.

  19. Amorphous silicon Schottky barrier solar cells incorporating a thin insulating layer and a thin doped layer

    DOEpatents

    Carlson, David E.

    1980-01-01

    Amorphous silicon Schottky barrier solar cells which incorporate a thin insulating layer and a thin doped layer adjacent to the junction forming metal layer exhibit increased open circuit voltages compared to standard rectifying junction metal devices, i.e., Schottky barrier devices, and rectifying junction metal insulating silicon devices, i.e., MIS devices.

  20. Doping-Spike PtSi Schottky Infrared Detectors with Extended Cutoff Wavelengths

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Park, J. S.; Gunapala, S. D.; Jones, E. W.; Castillo, H. M. Del

    1994-01-01

    A technique incorporating a p+ doping spike at the silicide/Si interface to reduce the effective Schottky barrier of the silicide infrared detectors and thus extend the cutoff wavelength has been developed.

  1. Doping-Spike PtSi Schottky Infrared Detectors with Extended Cutoff Wavelengths

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Park, J. S.; Gunapala, S. D.; Jones, E. W.; Castillo, H. M. Del

    1994-01-01

    A technique incorporating a p+ doping spike at the silicide/Si interface to reduce the effective Schottky barrier of the silicide infrared detectors and thus extend the cutoff wavelength has been developed.

  2. Transport and performance of a zero-Schottky barrier and doped contacts graphene nanoribbon transistors

    NASA Astrophysics Data System (ADS)

    Alam, Khairul

    2009-01-01

    The transport physics and performance of a top gate graphene nanoribbon (GNR) on an insulator transistor are studied for both the MOSFET like doped source-drain and the zero-Schottky barrier source-drain contacts. A voltage controlled tunnel barrier is the device transport physics. The doped source-drain contact device has a higher gate capacitance, higher transconductance, higher on/off current ratio and higher on-state current. The higher on-state current results in a lower switching delay of 17 fs, and the higher transconductance results in a higher intrinsic cut-off frequency of 27 THz in the doped source-drain contact device. The gate voltage, beyond the source-channel flat band condition, modulates both the tunnel and the thermal barrier in the doped source-drain contact devices and the tunnel barrier only in the Schottky contact devices. This limits the on-state current of Schottky contact devices.

  3. Electronic properties of delta -doped GaAs

    NASA Astrophysics Data System (ADS)

    Gold, A.; Ghazali, A.; Serre, J.

    1992-07-01

    For temperature zero the authors study the effects of disorder on the electronic properties of the two-dimensional electron gas which exists in planar-doped ( delta -doped) GaAs. The density of states, the Fermi level, the single-particle relaxation time and the electron mobility are calculated as functions of the dopant concentration. The transition from a band tail to an impurity band and the nature of the metal-insulator transition are discussed. The authors compare the theoretical results on the mobility with some available experimental data.

  4. Dependence of barrier height on energy gap in Au n-type GaAs/1-x/P/x/ Schottky diodes

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1981-01-01

    Data are presented which show that the Schottky barrier height for gold on the ternary compound GaAs(1-x)P(x) follows the commonly assumed two-thirds of the band gap relationship. An explanation is given for the reason that previously published data did not exhibit this behavior.

  5. A low-cost fabrication method for sub-millimeter wave GaAs Schottky diode

    NASA Astrophysics Data System (ADS)

    Jenabi, Sarvenaz; Deslandes, Dominic; Boone, Francois; Charlebois, Serge A.

    2017-10-01

    In this paper, a submillimeter-wave Schottky diode is designed and simulated. Effect of Schottky layer thickness on cut-off frequency is studied. A novel microfabrication process is proposed and implemented. The presented microfabrication process avoids electron-beam (e-beam) lithography which reduces the cost. Also, this process provides more flexibility in selection of design parameters and allows significant reduction in the device parasitic capacitance. A key feature of the process is that the Schottky contact, the air-bridges, and the transmission lines, are fabricated in a single lift-off step. This process relies on a planarization method that is suitable for trenches of 1–10 μm deep and is tolerant to end-point variations. The fabricated diode is measured and results are compared with simulations. A very good agreement between simulation and measurement results are observed.

  6. Study of the characteristics current-voltage and capacitance-voltage in nitride GaAs Schottky diode

    NASA Astrophysics Data System (ADS)

    Rabehi, Abdelaziz; Amrani, Mohamed; Benamara, Zineb; Akkal, Boudali; Hatem-Kacha, Arslane; Robert-Goumet, Christine; Monier, Guillaume; Gruzza, Bernard

    2015-10-01

    This article reports the study of Au/GaN/GaAs Schottky diodes, where the thin GaN film is prepared by nitridation of GaAs substrates with thicknesses of 0.7 and 0.8 nm. The resulting GaN sample with thickness 0.8 nm is then treated with an annealing operation (heating to 620 °C) to improve the current transport. The current-voltage (I-V) and capacitance-voltage (C-V) of the Au/GaN/GaAs structures were investigated at room temperature. In fact, the I-V characteristics show that the annealed sample has low series resistance (Rs) and ideality factor (n) (63 Ω, 2.27 respectively) when compared to the values obtained in the untreated sample (1.83 kΩ, 3.31 respectively). The formation of the GaN layer on the gallium arsenide surface is investigated through calculation of the interface state density NSS with and without the presence of series resistance Rs. The value of the interface state density NSS(E) close to the mid-gap was estimated to be in the order of 4.7×1012 cm-2 eV-1 and 1.02× 1013 cm-2 eV-1 with and without the annealing operation, respectively. However, nitridation with the annealing operation at 620 °C improves the electrical properties of the resultant Schottky diode.

  7. Evaluation of GaAs Schottky gate bipolar transistor (SGBT) by electrothermal simulation

    NASA Astrophysics Data System (ADS)

    Hossin, M.; Johnson, C. M.; Wright, N. G.; O'Neill, A. G.

    2000-01-01

    A GaAs alternative to the Si IGBT, employing an implanted lateral channel in place of the usual MOSFET inversion channel, is proposed. A simplified analytical model shows that the relatively high ratio of electron to hole mobility in GaAs allows much lower anode emitter injection efficiencies to be used without compromising conductivity modulation of the base region. This, in turn, means that a higher proportion of the total device current is carried by electrons. Design strategies for the GaAs SGBT are investigated and applied in the design of an optimised unit cell. The optimised structure is compared with an equivalent Si IGBT structure by means of electrothermal and transient simulation. Electrothermal simulation shows the GaAs device to have useable performance at junction temperatures in excess of 300°C, a feature which is consistent with the wide band-gap of GaAs. Transient simulations show reduced minority carrier tailing effects at both turn-on and turn-off, with initial turn-off tail currents being reduced by a factor of 5 compared to the Si IGBT. The resulting reduction in turn-off loss allows switching frequencies to be increased by a factor of 4 for the same total losses. The excellent switching performance derives from the relatively low proportion of hole current needed to ensure effective conductivity modulation of the structure.

  8. Effects of low-level boron doping on the photocurrent of amorphous silicon Schottky photodiodes

    NASA Astrophysics Data System (ADS)

    Kakinuma, H.; Kasuya, Y.; Sakamoto, M.; Shibata, S.

    1989-03-01

    The effects of low-level boron doping on the photocurrent-electric field (Jph-F) characteristics of amorphous silicon Schottky photodiodes were investigated by measuring the Jph-F characteristics of a lightly B-doped photodiode with a configuration of Cr/a-Si:H/tin-doped indium oxide (ITO). The Jph-F curves, which were found to be strongly dependent on the B-doping ratio, were analyzed on the basis of Crandall's (1984) theory, and the B-doping dependencies of the mobility-lifetime (mu-tau) product for electrons and holes were deduced. The effects of low-level B-doping on the mu-tau products and space charges of the photodiodes were discussed in terms of the charge state of the dangling bond state.

  9. Microstructure and contact resistance temperature dependence of Pt/Ti ohmic contact to Zn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Katz, A.; Nakahara, S.; Savin, W.; Weir, B. E.

    1990-10-01

    Ohmic contacts to p-GaAs, Zn doped at 5×1018 and 1×1019 cm-3, with the best specific contact resistance of 1.2×10-5 and 2.4×10-6 Ω cm2, respectively, have been formed with deposited layers of Ti and Pt. These layers, which were sequentially evaporated and then rapid thermally processed at 450 °C for 30 s, contained an interfacial layer constituted mainly of the TiAs phase adjacent to the substrate and the TixGa1-x solid solution in between it and the Ti layer. In addition, a significant amount of the Pt3Ti intermetallic was found at the Ti/Pt interface. The same metallization scheme, applied to 1×1018 cm-3 Zn-doped GaAs, produced a Schottky contact for the as-deposited and heat-treated samples. The temperature dependence characteristic of the specific contact resistance of the as-deposited Pt/Ti contacts to 5×1018 and 1×1019 cm-3 Zn-doped GaAs revealed a thermionic emission dominated carrier transport mechanism with an apparent barrier height of about 0.118 and 0.115 eV, respectively. This mechanism remained as the dominated one for the heat-treated contacts to the lower doped substrate. The contact resistance of the heat-treated contacts to the more heavily doped substrate, however, revealed a weaker temperature dependence. This indicates a conversion to a mixture of thermionic and field-emission carrier transport mechanisms across the interfacial barrier, and a reduced barrier height to a minimum value of 0.068 eV measured after sintering at 450 °C.

  10. Optimum doping achieves high quantum yields in GaAs photoemitters

    NASA Technical Reports Server (NTRS)

    Sonnenberg, H.

    1971-01-01

    Experimental data indicate that optimum doping exists. Measured quantum yield curves indicate optimum overall response is obtained in GaAs emitters with doping in high 10 to the 18th power per cu cm range. Doping for optimum response is not necessarily in this range.

  11. Band structure, band offsets, substitutional doping, and Schottky barriers of bulk and monolayer InSe

    NASA Astrophysics Data System (ADS)

    Guo, Yuzheng; Robertson, John

    2017-09-01

    We present a detailed study of the electronic structure of the layered semiconductor InSe. We calculate the band structure of the monolayer and bulk material using density functional theory, hybrid functionals, and G W . The band gap of the monolayer InSe is calculated to be 2.4 eV in screened exchange hybrid functional, close to the experimental photoluminescence gap. The electron affinities and band offsets are calculated for vertical stacked-layer heterostructures, and are found to be suitable for tunnel field effect transistors (TFETs) in combination with WS e2 or similar. The valence-band edge of InSe is calculated to lie 5.2 eV below the vacuum level, similar to that for the closed shell systems HfS e2 or SnS e2 . Hence InSe would be suitable to act as a p -type drain in the TFET. The intrinsic defects are calculated. For Se-rich layers, the Se adatom (interstitial) is found to be the most stable defect, whereas for In-rich layers, the Se vacancy is the most stable for the neutral state. Antisites tend to have energies just above those of vacancies. The Se antisite distorts towards a bond-breaking distortion as in the EL2 center of GaAs. Both substitutional donors and acceptors are calculated to be shallow, and effective dopants. They do not reconstruct to form nondoping configurations as occurs in black phosphorus. Finally, the Schottky barriers of metals on InSe are found to be strongly pinned by metal induced gap states (MIGS) at ˜0.5 eV above the valence-band edge. Any interfacial defects would lead to a stronger pinning at a similar energy. Overall, InSe is an effective semiconductor combining the good features of 2D (lack of dangling bonds, etc.) with the good features of 3D (effective doping), which few others achieve.

  12. GaAs Schottky barrier photo-responsive device and method of fabrication

    NASA Technical Reports Server (NTRS)

    Alcorn, G. E.; Leinkram, C. Z.; Okunola, O. (Inventor)

    1985-01-01

    A gallium arsenide photo-responsive device is provided with an intermediate, transparent layer of a refractory metal or alkaline earth metal forming a tenacious bond between a non-hydroscopic oxide layer and a noble metal Schottky barrier layer. The device has a gallium arsenide substrate with a predetermined type conductivity and a gallium arsenide epitaxial layer with the same type conductivity but a lower charge carrier concentration grown on the substrate. The oxide layer is formed to cover the epitaxial layer, and the transparent metal layer followed by the noble metal layer are deposited upon the oxide layer. An interdigitated ohmic contact is then formed upon the noble metal layer.

  13. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    SciTech Connect

    Casadei, Alberto; Heiss, Martin; Colombo, Carlo; Ruelle, Thibaud; Fontcuberta i Morral, Anna; Krogstrup, Peter; Roehr, Jason A.; Upadhyay, Shivendra; Sorensen, Claus B.; Nygard, Jesper

    2013-01-07

    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  14. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Casadei, Alberto; Krogstrup, Peter; Heiss, Martin; Röhr, Jason A.; Colombo, Carlo; Ruelle, Thibaud; Upadhyay, Shivendra; Sørensen, Claus B.; Nygârd, Jesper; Fontcuberta i Morral, Anna

    2013-01-01

    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  15. Single Schottky junction FETs based on Si:P nanowires with axially graded doping

    NASA Astrophysics Data System (ADS)

    Barreda, Jorge; Keiper, Timothy; Zhang, Mei; Xiong, Peng

    2015-03-01

    Si nanowires (NWs) with a systematic axial increase in phosphorus doping have been synthesized via a vapor-liquid-solid method. Silane and phosphine precursor gases are utilized for the growth and doping, respectively. The phosphorous doping profile is controlled by the flow ratio of the precursor gases. After the as-grown product is ultrasonically agitated into a solution, the Si NWs are dispersed on a SiO2 substrate with a highly doped Si back gate. Individual NWs are identified for the fabrication of field-effect transistors (FETs) with multiple Cr/Ag contacts along the NW. Two-probe and four-probe measurements are taken systematically under vacuum conditions at room temperature and the contribution from each contact and each NW section between adjacent contacts is determined. The graded doping level, produced by a systematic reduction in dopant density along the length of the NWs, is manifested in the regular increases in the channel and contact resistances. Our Si NWs facilitate the fabrication of asymmetric FETs with one ohmic and one Schottky contact. A significant increase in gate modulation is obtained due to the single Schottky-barrier contact. Characterization details and the applicability for sensing purposes will be discussed.

  16. Effect of Ion Sputtering on Interface Chemistry and Electrical Properties of an Gaas (100) Schottky Contacts

    NASA Technical Reports Server (NTRS)

    Wang, Y. X.; Holloway, P. H.

    1984-01-01

    Auger and electron photoelectron spectroscopy were used to measure the extent of As depletion during 1 keV to 5 keV argon sputtering of GaAs surfaces. This depletion was correlated with a general decrease in the barrier height of the rectifying Au contact deposited in situ. However, nondestructive angle resolved XPS measurements showed As was depleted at the outer surface more by 1 keV than 3 keV argon. These effects are explained based on a combined work effective work function model and creation of a donor like surface damage layer. The donor layer was correlated with As depletion by sputtering. Deep level trap formation and annealing of sputtering effects were studied.

  17. Laser-chemical vapor deposition of W Schottky contacts on GaAs using WF6 and SiH4

    NASA Astrophysics Data System (ADS)

    Tabbal, Malek; Meunier, Michel; Izquierdo, Ricardo; Beau, Bénédicte; Yelon, Arthur

    1997-05-01

    Tungsten was deposited on GaAs using a low-temperature laser-chemical vapor deposition process. A KrF excimer laser beam incident perpendicularly on a GaAs surface was found to induce metallic W formation from a gas mixture containing WF6 and SiH4 at laser energy densities as low as 25 mJ/cm2. In-situ x-ray photoelectron spectroscopy analysis shows that SiH4 plays an important role in the initiation of metallic W deposition at such low laser energy densities. Scanning electron microscopy of the W films shows a dense and regular columnar structure. Auger depth profiles show that the deposited W is pure. No impurities such as F, C, or O were observed, with a detection limit of 1 at. %, and the interdiffusion between W and GaAs is minimal. X-ray diffraction shows that the W film is mostly in the stable, highly conductive α phase, as confirmed by the low resistivity value of 21 μΩ cm. Metallic W features of 60 μm on GaAs were obtained by laser direct-projection patterning. I-V measurements show that the W-GaAs structures formed provide good quality Schottky contacts, with an average barrier height of 0.71 eV and an average ideality factor of 1.2. To our knowledge, these are the first Schottky diodes obtained using a laser based resistless projection patterning process on GaAs.

  18. Spectrally dependent photovoltages in Schottky photodiode based on (100) B-doped diamond

    SciTech Connect

    Čermák, Jan Rezek, Bohuslav; Koide, Yasuo; Takeuchi, Daisuke

    2014-02-07

    Spectrally and spatially resolved photovoltages were measured by Kelvin probe force microscopy (KPFM) on a Schottky photo-diode made of a 4 nm thin tungsten-carbide (WC) layer on a 500 nm oxygen-terminated boron-doped diamond epitaxial layer (O-BDD) that was grown on a Ib (100) diamond substrate. The diode was grounded by the sideways ohmic contact (Ti/WC), and the semitransparent Schottky contact was let unconnected. The electrical potentials across the device were measured in dark (only 650 nm LED of KPFM being on), under broad-band white light (halogen lamp), UV (365 nm diode), and deep ultraviolet (deuterium lamp) illumination. Illumination induced shift of the electrical potential remains within 210 mV. We propose that the photovoltage actually corresponds to a shift of Fermi level inside the BDD channel and thereby explains orders of magnitude changes in photocurrent.

  19. Spectrally dependent photovoltages in Schottky photodiode based on (100) B-doped diamond

    NASA Astrophysics Data System (ADS)

    Čermák, Jan; Koide, Yasuo; Takeuchi, Daisuke; Rezek, Bohuslav

    2014-02-01

    Spectrally and spatially resolved photovoltages were measured by Kelvin probe force microscopy (KPFM) on a Schottky photo-diode made of a 4 nm thin tungsten-carbide (WC) layer on a 500 nm oxygen-terminated boron-doped diamond epitaxial layer (O-BDD) that was grown on a Ib (100) diamond substrate. The diode was grounded by the sideways ohmic contact (Ti/WC), and the semitransparent Schottky contact was let unconnected. The electrical potentials across the device were measured in dark (only 650 nm LED of KPFM being on), under broad-band white light (halogen lamp), UV (365 nm diode), and deep ultraviolet (deuterium lamp) illumination. Illumination induced shift of the electrical potential remains within 210 mV. We propose that the photovoltage actually corresponds to a shift of Fermi level inside the BDD channel and thereby explains orders of magnitude changes in photocurrent.

  20. Multiple Schottky Barrier-Limited Field-Effect Transistors on a Single Silicon Nanowire with an Intrinsic Doping Gradient.

    PubMed

    Barreda, Jorge L; Keiper, Timothy D; Zhang, Mei; Xiong, Peng

    2017-04-05

    In comparison to conventional (channel-limited) field-effect transistors (FETs), Schottky barrier-limited FETs possess some unique characteristics which make them attractive candidates for some electronic and sensing applications. Consequently, modulation of the nano Schottky barrier at a metal-semiconductor interface promises higher performance for chemical and biomolecular sensor applications when compared to conventional FETs with ohmic contacts. However, the fabrication and optimization of devices with a combination of ideal ohmic and Schottky contacts as the source and drain, respectively, present many challenges. We address this issue by utilizing Si nanowires (NWs) synthesized by a chemical vapor deposition process which yields a pronounced doping gradient along the length of the NWs. Devices with a series of metal contacts on a single Si NW are fabricated in a single lithography and metallization process. The graded doping profile of the NW is manifested in monotonic increases in the channel and junction resistances and variation of the nature of the contacts from ohmic to Schottky of increasing effective barrier height along the NW. Hence multiple single Schottky junction-limited FETs with extreme asymmetry and high reproducibility are obtained on an individual NW. A definitive correlation between increasing Schottky barrier height and enhanced gate modulation is revealed. Having access to systematically varying Schottky barrier contacts on the same NW device provides an ideal platform for identifying optimal device characteristics for sensing and electronic applications.

  1. n-Type Doping of Vapor-Liquid-Solid Grown GaAs Nanowires.

    PubMed

    Gutsche, Christoph; Lysov, Andrey; Regolin, Ingo; Blekker, Kai; Prost, Werner; Tegude, Franz-Josef

    2011-12-01

    In this letter, n-type doping of GaAs nanowires grown by metal-organic vapor phase epitaxy in the vapor-liquid-solid growth mode on (111)B GaAs substrates is reported. A low growth temperature of 400°C is adjusted in order to exclude shell growth. The impact of doping precursors on the morphology of GaAs nanowires was investigated. Tetraethyl tin as doping precursor enables heavily n-type doped GaAs nanowires in a relatively small process window while no doping effect could be found for ditertiarybutylsilane. Electrical measurements carried out on single nanowires reveal an axially non-uniform doping profile. Within a number of wires from the same run, the donor concentrations ND of GaAs nanowires are found to vary from 7 × 10(17) cm(-3) to 2 × 10(18) cm(-3). The n-type conductivity is proven by the transfer characteristics of fabricated nanowire metal-insulator-semiconductor field-effect transistor devices.

  2. n-Type Doping of Vapor–Liquid–Solid Grown GaAs Nanowires

    PubMed Central

    2011-01-01

    In this letter, n-type doping of GaAs nanowires grown by metal–organic vapor phase epitaxy in the vapor–liquid–solid growth mode on (111)B GaAs substrates is reported. A low growth temperature of 400°C is adjusted in order to exclude shell growth. The impact of doping precursors on the morphology of GaAs nanowires was investigated. Tetraethyl tin as doping precursor enables heavily n-type doped GaAs nanowires in a relatively small process window while no doping effect could be found for ditertiarybutylsilane. Electrical measurements carried out on single nanowires reveal an axially non-uniform doping profile. Within a number of wires from the same run, the donor concentrations ND of GaAs nanowires are found to vary from 7 × 1017 cm-3 to 2 × 1018 cm-3. The n-type conductivity is proven by the transfer characteristics of fabricated nanowire metal–insulator-semiconductor field-effect transistor devices. PMID:27502686

  3. Microscopic identification of native donor Ga-vacancy complexes in Te-doped GaAs

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Lausmann, M.; Staab, T. E. M.; Krause-Rehberg, R.; Hakala, M.; Puska, M. J.

    1999-07-01

    Native vacancies in Te-doped (5×1016-5×1018 cm-3) GaAs were investigated by means of positron lifetime and Doppler-broadening coincidence spectroscopy. The experimental data were related to theoretical calculations of the positron lifetime and the annihilation momentum distribution. Monovacancies were observed in all Te-doped GaAs samples under study. It will be shown that they can directly be identified to be Ga-vacancy-TeAs-donor complexes. These complexes are the dominating type of vacancy defects in the doping range under observation.

  4. Quantum confinement: A route to enhance the Curie temperature of Mn doped GaAs

    NASA Astrophysics Data System (ADS)

    Mandal, Basudeb; Chandra, Hirak Kumar; Kumari, Poonam; Mahadevan, Priya

    2017-07-01

    The electronic structure of Mn doped GaAs and GaN have been examined within a multiband Hubbard model. By virtue of the positioning of the Mn d states, Mn doped GaAs is found to belong to the p -d metal regime of the Zaanen-Sawatzky-Allen phase diagram and its variants, while Mn doping in GaN belongs to the covalent insulator regime. Their location in the phase diagram also determines how they would behave under quantum confinement which would increase the charge transfer energy. The ferromagnetic stability of Mn doped GaAs, we find, increases with confinement therefore providing a route to higher ferromagnetic transition temperatures.

  5. A novel ultra steep dynamically reconfigurable electrostatically doped silicon nanowire Schottky Barrier FET

    NASA Astrophysics Data System (ADS)

    Singh, Sangeeta; Sinha, Ruchir; Kondekar, P. N.

    2016-05-01

    In this paper, an ultra steep, symmetric and dynamically configurable, electrostatically doped silicon nanowire Schottky FET (E-SiNW-SB-FET) based on dopant-free technology is investigated. It achieves the ultra steep sub-threshold slope (SS) due to the cumulative effect of weak impact-ionization induced positive feedback and electrostatic modulation of Schottky barrier heights at both source and drain terminals. It consists of axial nanowire heterostructure (silicide-intrinsic silicon-silicide) with three independent all-around gates, two gates are polarity control gates for dynamically reconfiguring the device polarity by modulating the effective Schottky barrier heights and a control gate switches the device ON and OFF. The most interesting features of the proposed structure are simplified fabrication process as the state-of-the-art for ion implantation and high thermal budget no more required for annealing. It is highly immune to process variations, doping control issues and random dopant fluctuations (RDF) and there are no mobility degradation issues related to high doping. A calibrated 3-D TCAD simulation results exhibit the SS of 2 mV/dec for n-type E-SiNW-SB-FET and 9 mV/dec for p-type E-SiNW-SB-FET for about five decades of current. Further, it resolves all the reliability related issues of IMOS as hot electron effects are no more limiting our device performance. It offers significant drive current of the order of 10-5-10-4 A and magnificently high ION/IOFF ratio of ∼108 along with the inherent advantages of symmetric device structure for its circuit realization.

  6. Design Considerations for Heavily-Doped Cryogenic Schottky Diode Varactor Multipliers

    NASA Technical Reports Server (NTRS)

    Schlecht, E.; Maiwald, F.; Chattopadhyay, G.; Martin, S.; Mehdi, I.

    2001-01-01

    Diode modeling for Schottky varactor frequency multipliers above 500 GHz is presented with special emphasis placed on simple models and fitted equations for rapid circuit design. Temperature- and doping-dependent mobility, resistivity, and avalanche current multiplication and breakdown are presented. Next is a discussion of static junction current, including the effects of tunneling as well as thermionic emission. These results have been compared to detailed measurements made down to 80 K on diodes fabricated at JPL, followed by a discussion of the effect on multiplier efficiency. Finally, a simple model of current saturation in the undepleted active layer suitable for inclusion in harmonic balance simulators is derived.

  7. Recombination dynamics in aerotaxy-grown Zn-doped GaAs nanowires.

    PubMed

    Zhang, Wei; Yang, Fangfang; Messing, Maria E; Mergenthaler, Kilian; Pistol, Mats-Erik; Deppert, Knut; Samuelson, Lars; Magnusson, Martin H; Yartsev, Arkady

    2016-11-11

    In this paper we have investigated the dynamics of photo-generated charge carriers in a series of aerotaxy-grown GaAs nanowires (NWs) with different levels of Zn doping. Time-resolved photo-induced luminescence and transient absorption have been employed to investigate radiative (band edge transition) and non-radiative charge recombination processes, respectively. We find that the photo-luminescence (PL) lifetime of intrinsic GaAs NWs is significantly increased after growing an AlGaAs shell over them, indicating that an AlGaAs shell can effectively passivate the surface of aerotaxy-grown GaAs NWs. We observe that PL decay time as well as PL intensity decrease with increasing Zn doping, which can be attributed to thermally activated electron trapping with the trap density increased due to the Zn doping level.

  8. Recombination dynamics in aerotaxy-grown Zn-doped GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Yang, Fangfang; Messing, Maria E.; Mergenthaler, Kilian; Pistol, Mats-Erik; Deppert, Knut; Samuelson, Lars; Magnusson, Martin H.; Yartsev, Arkady

    2016-11-01

    In this paper we have investigated the dynamics of photo-generated charge carriers in a series of aerotaxy-grown GaAs nanowires (NWs) with different levels of Zn doping. Time-resolved photo-induced luminescence and transient absorption have been employed to investigate radiative (band edge transition) and non-radiative charge recombination processes, respectively. We find that the photo-luminescence (PL) lifetime of intrinsic GaAs NWs is significantly increased after growing an AlGaAs shell over them, indicating that an AlGaAs shell can effectively passivate the surface of aerotaxy-grown GaAs NWs. We observe that PL decay time as well as PL intensity decrease with increasing Zn doping, which can be attributed to thermally activated electron trapping with the trap density increased due to the Zn doping level.

  9. Dopant mapping of Be δ-doped layers in GaAs tailored by counterdoping using scanning tunneling microscopy

    NASA Astrophysics Data System (ADS)

    Ebert, Ph.; Landrock, S.; Chiu, Y. P.; Breuer, U.; Dunin-Borkowski, R. E.

    2012-11-01

    The effect of counterdoping on the Be dopant distribution in delta (δ)-doped layers embedded in Si-doped and intrinsic GaAs is investigated by cross-sectional scanning tunneling microscopy. δ-doped layers in intrinsic GaAs exhibit a large spreading, whereas those surrounded by Si-doped GaAs remain spatially localized. The different spreading is explained by the Fermi-level pinning at the growth surface, which leads to an increased Ga vacancies concentration with increasing Si counterdoping. The Ga vacancies act as sinks for the diffusing Be dopant atoms, hence retarding the spreading.

  10. Determination of the charge carrier compensation mechanism in Te-doped GaAs by scanning tunneling microscopy

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Weber, E. R.; Jäger, N. D.; Urban, K.; Ebert, Ph.

    2003-03-01

    We identified the charge carrier compensation mechanism in Te-doped GaAs with atomically resolved scanning tunneling microscopy. Three types of defects were found: tellurium donors (TeAs), Ga vacancies (VGa), and Ga vacancy-donor complexes (VGa-TeAs). We show quantitatively that the compensation in Te-doped bulk GaAs is exclusively caused by vacancy-donor complexes in contrast to Si-doped GaAs. This is explained with the Fermi-level effect as the universal mechanism leading to Ga vacancy formation in n-doped GaAs, and a Coulomb interaction leading to the formation of the complexes. The quantification of the carrier compensation yields a -3e charge state of VGa in bulk GaAs.

  11. Observation of As-Grown Defects in Zn-Doped GaAs by Positron Lifetime Spectra

    NASA Astrophysics Data System (ADS)

    Wang, Zhu; Wang, Shao-Jie; Chen, Zhi-Quan

    2000-11-01

    Positron lifetime spectra were measured for the Zn-doped p-type GaAs. In comparing the horizontal-Bridgman-method-grown and the floating-zone-method grown p-type GaAs with the liquid-encapsulation-Czochralski-grown p-type GaAs samples, positron trapping into vacancy type defects was observed in the former two grown p-type GaAs. Shallow positron traps were detected, and the dominant ones were attributed to acceptor the in p-type GaAs.

  12. Te-doping of self-catalyzed GaAs nanowires

    SciTech Connect

    Suomalainen, S. Hakkarainen, T. V.; Salminen, T.; Koskinen, R.; Guina, Mircea; Honkanen, M.; Luna, E.

    2015-07-06

    Tellurium (Te)-doping of self-catalyzed GaAs nanowires (NWs) grown by molecular beam epitaxy is reported. The effect of Te-doping on the morphological and crystal structure of the NWs is investigated by scanning electron microscopy and high-resolution transmission electron microscopy. The study reveals that the lateral growth rate increases and axial growth rate decreases with increasing Te doping level. The changes in the NW morphology can be reverted to some extent by changing the growth temperature. At high doping levels, formation of twinning superlattice is observed alongside with the (111)-facetted sidewalls. Finally, the incorporation of Te is confirmed by Raman spectroscopy.

  13. Design and characterisations of double-channel GaAs pHEMT Schottky diodes based on vertically stacked MMICs for a receiver protection limiter

    NASA Astrophysics Data System (ADS)

    Haris, Norshakila; Kyabaggu, Peter B. K.; Rezazadeh, Ali A.

    2016-07-01

    A microwave receiver protection limiter circuit has been designed, fabricated and tested using vertically stacked GaAs MMIC technology. The limiter circuit with a dimension of 2.5 × 1.3 mm2 is formed by using double-channel AlGaAs/InGaAs pseudomorphic HEMT (pHEMT) Schottky diodes integrated with a low-loss V-shaped coplanar waveguide multilayer structure. The electrical parameter characteristics of the pHEMT Schottky diodes are presented including the C-V profile showing the presence of a double channel in the device layer structure. This unique feature can also be seen from the double-peak responses of the electron density as a function of the device layer width, which represent the high electron concentration at two different 2-DEG layers of the structure. An equivalent circuit model of pHEMT Schottky diodes is demonstrated showing good agreement with the measurement results. At zero-bias condition, the devices show high performance in diode detector applications with voltage sensitivities of more than 89 mV μW-1 at 10 GHz and at least 5.4 mV μW-1 at 35 GHz. The measurement results of the limiter circuit demonstrated the blocking of input power signals greater than 20 dBm input power at 3 GHz. To the best of our knowledge this is the first demonstration of the use of pHEMT Schottky diodes in microwave power limiter applications.

  14. Can electrical deactivation of highly Si-doped GaAs be explained by autocompensation

    SciTech Connect

    Schuppler, S.; Adler, D.L.; Pfeiffer, L.N.; West, K.W.; Chaban, E.E.; Citrin, P.H. )

    1993-10-25

    Using near-edge x-ray absorption fine structure, the first experimental determination of Si atom concentrations occupying As sites in Si-doped GaAs (100) is reported. The measurements reveal that at high doping levels ([approx gt]10[sup 19] cm[sup [minus]3]) in molecular-beam-epitaxy-grown samples, the number of such [ital p]-type Si atoms is insufficient to account for the observed large reduction of free-carriers.

  15. Towards low-dimensional hole systems in Be-doped GaAs nanowires.

    PubMed

    Ullah, A R; Gluschke, J G; Krogstrup, P; Sørensen, C B; Nygård, J; Micolich, A P

    2017-03-01

    GaAs was central to the development of quantum devices but is rarely used for nanowire-based quantum devices with InAs, InSb and SiGe instead taking the leading role. p-type GaAs nanowires offer a path to studying strongly confined 0D and 1D hole systems with strong spin-orbit effects, motivating our development of nanowire transistors featuring Be-doped p-type GaAs nanowires, AuBe alloy contacts and patterned local gate electrodes towards making nanowire-based quantum hole devices. We report on nanowire transistors with traditional substrate back-gates and EBL-defined metal/oxide top-gates produced using GaAs nanowires with three different Be-doping densities and various AuBe contact processing recipes. We show that contact annealing only brings small improvements for the moderately doped devices under conditions of lower anneal temperature and short anneal time. We only obtain good transistor performance for moderate doping, with conduction freezing out at low temperature for lowly doped nanowires and inability to reach a clear off-state under gating for the highly doped nanowires. Our best devices give on-state conductivity 95 nS, off-state conductivity 2 pS, on-off ratio [Formula: see text], and sub-threshold slope 50 mV/dec at [Formula: see text] K. Lastly, we made a device featuring a moderately doped nanowire with annealed contacts and multiple top-gates. Top-gate sweeps show a plateau in the sub-threshold region that is reproducible in separate cool-downs and indicative of possible conductance quantisation highlighting the potential for future quantum device studies in this material system.

  16. Towards low-dimensional hole systems in Be-doped GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Ullah, A. R.; Gluschke, J. G.; Krogstrup, P.; Sørensen, C. B.; Nygård, J.; Micolich, A. P.

    2017-03-01

    GaAs was central to the development of quantum devices but is rarely used for nanowire-based quantum devices with InAs, InSb and SiGe instead taking the leading role. p-type GaAs nanowires offer a path to studying strongly confined 0D and 1D hole systems with strong spin–orbit effects, motivating our development of nanowire transistors featuring Be-doped p-type GaAs nanowires, AuBe alloy contacts and patterned local gate electrodes towards making nanowire-based quantum hole devices. We report on nanowire transistors with traditional substrate back-gates and EBL-defined metal/oxide top-gates produced using GaAs nanowires with three different Be-doping densities and various AuBe contact processing recipes. We show that contact annealing only brings small improvements for the moderately doped devices under conditions of lower anneal temperature and short anneal time. We only obtain good transistor performance for moderate doping, with conduction freezing out at low temperature for lowly doped nanowires and inability to reach a clear off-state under gating for the highly doped nanowires. Our best devices give on-state conductivity 95 nS, off-state conductivity 2 pS, on-off ratio ∼ {10}4, and sub-threshold slope 50 mV/dec at T=4 K. Lastly, we made a device featuring a moderately doped nanowire with annealed contacts and multiple top-gates. Top-gate sweeps show a plateau in the sub-threshold region that is reproducible in separate cool-downs and indicative of possible conductance quantisation highlighting the potential for future quantum device studies in this material system.

  17. Diode-pumped passively Q-switched Nd:GGG laser with a Bi-doped GaAs semiconductor saturable absorber

    NASA Astrophysics Data System (ADS)

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-12-01

    Passive Q-switching of a diode-pumped Nd:GGG laser is demonstrated using Bi-doped GaAs as saturable absorber. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. Compared with the Q-switched laser by undoped GaAs semiconductor saturable absorber, the laser with Bi-doped GaAs as saturable absorber can produce higher output power, shorter pulses, higher single pulse energies and higher peak powers. These results suggest that Bi-doped GaAs can be a promising new candidate of semiconductor saturable absorber in Q-switched laser.

  18. Passively Q-switched and mode-locked Nd:GGG laser with a Bi-doped GaAs saturable absorber.

    PubMed

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-06-16

    A simultaneously passively Q-switched and mode-locked (QML) Nd:GGG laser using a Bi-doped GaAs wafer as saturable absorber is accomplished for the first time. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. In comparison to the passively QML laser with GaAs, the QML laser with Bi-doped GaAs can generate more stable pulses with 99% modulation depth. The experiment results indicate that the Bi-doped GaAs could be an excellent saturable absorber for diode-pumped QML lasers.

  19. Increased Photoconductivity Lifetime in GaAs Nanowires by Controlled n-Type and p-Type Doping.

    PubMed

    Boland, Jessica L; Casadei, Alberto; Tütüncüoglu, Gözde; Matteini, Federico; Davies, Christopher L; Jabeen, Fauzia; Joyce, Hannah J; Herz, Laura M; Fontcuberta I Morral, Anna; Johnston, Michael B

    2016-04-26

    Controlled doping of GaAs nanowires is crucial for the development of nanowire-based electronic and optoelectronic devices. Here, we present a noncontact method based on time-resolved terahertz photoconductivity for assessing n- and p-type doping efficiency in nanowires. Using this technique, we measure extrinsic electron and hole concentrations in excess of 10(18) cm(-3) for GaAs nanowires with n-type and p-type doped shells. Furthermore, we show that controlled doping can significantly increase the photoconductivity lifetime of GaAs nanowires by over an order of magnitude: from 0.13 ns in undoped nanowires to 3.8 and 2.5 ns in n-doped and p-doped nanowires, respectively. Thus, controlled doping can be used to reduce the effects of parasitic surface recombination in optoelectronic nanowire devices, which is promising for nanowire devices, such as solar cells and nanowire lasers.

  20. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2011-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW

  1. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2010-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW.

  2. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2010-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW.

  3. An Integrated 520-600 GHz Sub-Harmonic Mixer and Tripler Combination Based on GaAs MMIC Membrane Planar Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Thomas, B.; Gill, J.; Maestrini, A.; Lee, C.; Lin, R.; Sin, S.; Peralta, A.; Mehdi, I.

    2011-01-01

    We present here the design, development and test of an integrated sub-millimeter front-end featuring a 520-600 GHz sub-harmonic mixer and a 260-300 GHz frequency tripler in a single cavity. Both devices used GaAs MMIC membrane planar Schottky diode technology. The sub-harmonic mixer/tripler circuit has been tested using conventional machined as well as silicon micro-machined blocks. Measurement results on the metal block give best DSB mixer noise temperature of 2360 K and conversion losses of 7.7 dB at 520 GHz. Preliminary results on the silicon micro-machined blocks give a DSB mixer noise temperature of 4860 K and conversion losses of 12.16 dB at 540 GHz. The LO input power required to pump the integrated tripler/sub-harmonic mixer for both packages is between 30 and 50 mW

  4. Carbon doping in GaAs grown by MOVPE with trimethylgallium and triethylarsenic

    NASA Astrophysics Data System (ADS)

    Pak, Kangsa; Ashizuka, Kazuaki; Fukazawa, Hidetaka; Yamashita, Seiji; Takano, Yasushi; Yonezu, Hiroo

    1990-12-01

    Heavily carbon doped GaAs epitaxial layers were grown by low-pressure MOVPE using TMGa and TEAs as the source materials. GaAs epitaxial layers with hole concentrations up to 2.4×10 20 cm -3 were obtained. The hole concentrations of the films increased as the growth temperature (500-600°C) and/or the growth pressure (10-100 Torr) decreased, and were less dependent on V/III molar ratio (10-30). The uniform incorporation of carbon atoms during the growth was confirmed from SIMS measurements.

  5. Heterodimensional Schottky contacts to modulation-doped heterojunction with application to photodetection

    NASA Astrophysics Data System (ADS)

    Seddik, Amro Anwar

    The growing technological demand for high speed and compact integrated electronics and Optics is a pressing challenge. Speed and compactness necessitate low power consumption semiconductors with high transport mobility carriers, with potential of ultra large-scale integration of electronic and Optoelectronics circuitry. One avenue to fulfill these requirements is to utilize reduced dimensionality where carriers are spatially confined to less than three-dimensions, causing their energy levels to become quantized and their transport favorably affected. With recent progress in semiconductor growth and processing technologies low dimensionality has become practically realizable, this makes the study of contact properties to these systems increasingly important. In this work we study the contact between a low- dimensional semiconductor structure and a three- dimensional metal and the application of such a contact in photodetection. We theoretically derive the thermionic emission current for Schottky contact to two-dimensional and one-dimensional structures. The derivation underscores the discrete nature of low-dimensional structures and shows that the thermionic emission current is reduced by a factor exponentially proportional to the first quantized energy level. We also propose and formulate, for the first time, a physical phenomenon in two-dimensional structures created by modulation doping of a heterojunction, which is the effect of the cloud of electrons in the small bandgap material on the thermionic emission current. We have named this the electron- electron cloud effect; we show that this interaction increases the effective Schottky barrier height in a fashion counter to the image force lowering mechanism. In order to realize Schottky contact to low-dimensional structures, we have fabricated a novel Heterojunction Metal-Semiconductor-Metal (HMSM) photodetector. Experimental characterization and the general trends of the behavior of the HMSM devices are presented

  6. Electric field breakdown of lateral-type Schottky diodes formed on lightly doped homoepitaxial diamond

    NASA Astrophysics Data System (ADS)

    Teraji, Tokuyuki; Koizumi, Satoshi; Koide, Yasuo; Ito, Toshimichi

    2008-07-01

    The reverse current of lateral-type Schottky diodes fabricated on p-type homoepitaxial diamond was analyzed by changing the distance between Schottky and Ohmic electrodes and the metal materials in the Schottky electrodes. The maximum electric field at breakdown was 0.56 MV cm -1 for the Au Schottky contact and less than 0.26 MV cm -1 for the Al Schottky contact. The breakdown voltage depended on the electrode distance when the diamond surface was revealed in vacuum, whereas the Schottky diodes sustained the applied voltage of 500 V, corresponding to 0.69 MV cm -1, after covering of the diamond surface with an insulating liquid. Diamond surface protection is an indispensable technique for fabrication of high-voltage Schottky diodes based on diamond.

  7. Doping concentration dependence of the photoluminescence spectra of n-type GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Arab, Shermin; Yao, Maoqing; Zhou, Chongwu; Daniel Dapkus, P.; Cronin, Stephen B.

    2016-05-01

    In this letter, the photoluminescence spectra of n-type doped GaAs nanowires, grown by the metal organic chemical vapor deposition method, are measured at 4 K and 77 K. Our measurements indicate that an increase in carrier concentration leads to an increase in the complexity of the doping mechanism, which we attribute to the formation of different recombination centers. At high carrier concentrations, we observe a blueshift of the effective band gap energies by up to 25 meV due to the Burstein-Moss shift. Based on the full width at half maximum (FWHM) of the photoluminescence peaks, we estimate the carrier concentrations for these nanowires, which varies from 6 × 1017 cm-3 (lightly doped), to 1.5 × 1018 cm-3 (moderately doped), to 3.5 × 1018 cm-3 (heavily doped) as the partial pressure of the disilane is varied from 0.01 sccm to 1 sccm during the growth process. We find that the growth temperature variation does not affect the radiative recombination mechanism; however, it does lead to a slight enhancement in the optical emission intensities. For GaAs nanowire arrays measured at room temperature, we observe the same general dependence of band gap, FWHM, and carrier concentration on doping.

  8. Doping concentration dependence of the photoluminescence spectra of n-type GaAs nanowires

    SciTech Connect

    Arab, Shermin; Yao, Maoqing; Zhou, Chongwu; Cronin, Stephen B.; Daniel Dapkus, P.

    2016-05-02

    In this letter, the photoluminescence spectra of n-type doped GaAs nanowires, grown by the metal organic chemical vapor deposition method, are measured at 4 K and 77 K. Our measurements indicate that an increase in carrier concentration leads to an increase in the complexity of the doping mechanism, which we attribute to the formation of different recombination centers. At high carrier concentrations, we observe a blueshift of the effective band gap energies by up to 25 meV due to the Burstein-Moss shift. Based on the full width at half maximum (FWHM) of the photoluminescence peaks, we estimate the carrier concentrations for these nanowires, which varies from 6 × 10{sup 17} cm{sup −3} (lightly doped), to 1.5 × 10{sup 18} cm{sup −3} (moderately doped), to 3.5 × 10{sup 18} cm{sup −3} (heavily doped) as the partial pressure of the disilane is varied from 0.01 sccm to 1 sccm during the growth process. We find that the growth temperature variation does not affect the radiative recombination mechanism; however, it does lead to a slight enhancement in the optical emission intensities. For GaAs nanowire arrays measured at room temperature, we observe the same general dependence of band gap, FWHM, and carrier concentration on doping.

  9. Theoretical Investigation of Large-Signal Noise in Nanometric Schottky-Barrier Diodes Operating in External Resonant Circuits

    NASA Astrophysics Data System (ADS)

    Shiktorov, P.; Starikov, E.; Gružinskis, V.; Varani, L.; Vaissière, J. C.; Reggiani, L.; Pérez, S.; González, T.

    2005-02-01

    We report Monte Carlo simulations of electronic noise in heavily doped nanometric GaAs Schottky-barrier diodes operating in series with a parallel resonant circuit when a high-frequency large-signal voltage is applied to the whole system. Significant modifications of the noise spectrum with respect to the unloaded diode are found to occur in the THz-region.

  10. Characteristics of n-Type Asymmetric Schottky-Barrier Transistors with Silicided Schottky-Barrier Source and Heavily n-Type Doped Channel and Drain

    NASA Astrophysics Data System (ADS)

    Lin, Zer-Ming; Lin, Horng-Chih; Huang, Tiao-Yuan

    2012-06-01

    In this study, we explore the operation of operation a novel asymmetric Schottky-barrier transistor (ASSBT) through using technology computer aided design (TCAD). The new ASSBT features a silicided Schottky-barrier (SB) source, with the channel and drain made of heavily n-doped silicon. By eliminating the SB drain junction contained in conventional symmetrical-type SB metal-oxide-semiconductor field-effect transistors (MOSFETs), a larger on-state current is achievable. Moreover, combined with the adoption of fully depleted thin-film channel, the off-state leakage current can be efficiently suppressed as well. In addition, we also comprehensively analyze the transport mechanisms dominating in different operational regions of this new ASSBT. A pseudo-subthreshold region that shows worse subthreshold swing (SS) than the subthreshold region is identified. A decrease in channel and/or gate oxide thicknesses can contribute to the improvement of the SS of this region. A modified form of scaling length (λ) is also introduced to describe the impacts of structural parameters and gate configurations on the SS characteristics of this new ASSBT.

  11. Optical and Surface Characteristics of Mg-Doped GaAs Nanocrystalline Thin Film Deposited by Thermionic Vacuum Arc Technique

    NASA Astrophysics Data System (ADS)

    Pat, Suat; Özen, Soner; Şenay, Volkan; Korkmaz, Şadan

    2017-01-01

    Magnesium (Mg) is the most promising p-type dopant for gallium arsenide (GaAs) semiconductor technology. Mg-doped GaAs nanocrystalline thin film has been deposited at room temperature by the thermionic vacuum arc technique, a rapid deposition method for production of doped GaAs material. The microstructure and surface and optical properties of the deposited sample were investigated by x-ray diffraction analysis, scanning electron microscopy, energy-dispersive x-ray spectroscopy, atomic force microscopy, ultraviolet-visible spectrophotometry, and interferometry. The crystalline direction of the deposited sample was determined to be (220) plane and (331) plane at 44.53° and 72.30°, respectively. The Mg-doped GaAs nanocrystalline sample showed high transmittance.

  12. Design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph; Goradia, Chandra; Brinker, David

    1987-01-01

    A new GaAs nipi doping superlattice solar cell structure is presented, which holds promise for high efficiency coupled with very high radiation tolerance. The structure has all contacts on the unilluminated side. Design constraints are presented which this structure must satisfy in order to exhibit high efficiency and high radiation tolerance. The results of self-consistent quantum mechanical calculations are presented which show that a viable design of this cell would include relatively thick n and p layers which are fairly heavily doped.

  13. GaN-based Schottky barrier ultraviolet photodetectors with graded doping on patterned sapphire substrates

    NASA Astrophysics Data System (ADS)

    Mou, Wenjie; Zhao, Linna; Chen, Leilei; Yan, Dawei; Ma, Huarong; Yang, Guofeng; Gu, Xiaofeng

    2017-07-01

    In this paper, we demonstrate high performance GaN-based Schottky-barrier ultraviolet (UV) photodetectors with graded doping prepared on patterned sapphire substrates. The fabricated devices exhibit an extremely low dark current density of ∼1.3 × 10-8 A/cm2 under -5 V bias, a large UV-to-visible light rejection ratio of ∼4.2 × 103, and a peak external quantum efficiency of ∼50.7% at zero bias. Even in the deeper 250-360 nm range, the average external quantum efficiency still remains ∼40%. From the transient response characteristics, the average rising and falling time constants are estimated ∼115 μs and 120 μs, respectively, showing a good electrical and thermal reliability. The specific detectivities D∗, limited by the thermal equilibrium noise and the low-frequency 1/f noise, are derived ∼5.5 × 1013 cm Hz1/2/W (at 0 V) and ∼2.68 × 1010 cm Hz1/2 W-1 (at -5 V), respectively.

  14. Divacancy complexes induced by Cu diffusion in Zn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Elsayed, M.; Krause-Rehberg, R.; Korff, B.; Ratschinski, I.; Leipner, H. S.

    2013-08-01

    Positron annihilation spectroscopy was applied to investigate the nature and thermal behavior of defects induced by Cu diffusion in Zn-doped p-type GaAs crystals. Cu atoms were intentionally introduced in the GaAs lattice through thermally activated diffusion from a thin Cu capping layer at 1100 °C under defined arsenic vapor pressure. During isochronal annealing of the obtained Cu-diffused GaAs in the temperature range of 450-850 K, vacancy clusters were found to form, grow and finally disappear. We found that annealing at 650 K triggers the formation of divacancies, whereas further increasing in the annealing temperature up to 750 K leads to the formation of divacancy-copper complexes. The observations suggest that the formation of these vacancy-like defects in GaAs is related to the out-diffusion of Cu. Two kinds of acceptors are detected with a concentration of about 1016 - 1017 cm-3, negative ions and arsenic vacancy copper complexes. Transmission electron microscopy showed the presence of voids and Cu precipitates which are not observed by positron measurements. The positron binding energy to shallow traps is estimated using the positron trapping model. Coincidence Doppler broadening spectroscopy showed the presence of Cu in the immediate vicinity of the detected vacancies. Theoretical calculations suggested that the detected defect is VGaVAs-2CuGa.

  15. Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

    NASA Technical Reports Server (NTRS)

    Malik, R. J.; Nottenberg, R. N.; Schubert, E. F.; Walker, J. F.; Ryan, R. W.

    1988-01-01

    Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament. Controlled carbon acceptor concentrations over the range of 10 to the 17th-10 to the 20th/cu cm were achieved by resistively heating a graphite filament with a direct current power supply. Capacitance-voltage, p/n junction and secondary-ion mass spectrometry measurements indicate that there is negligible diffusion of carbon during growth and with postgrowth rapid thermal annealing. Carbon was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors. Current gains greater than 100 and near-ideal emitter heterojunctions were obtained in transistors with a carbon base doping of 1 x 10 to the 19th/cu cm. These preliminary results indicate that carbon doping from a solid graphite source may be an attractive substitute for beryllium, which is known to have a relatively high diffusion coefficient in GaAs.

  16. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    MAR,ALAN; LOUBRIEL,GUILLERMO M.; ZUTAVERN,FRED J.; O'MALLEY,MARTIN W.; HELGESON,WESLEY D.; BROWN,DARWIN JAMES; HJALMARSON,HAROLD P.; BACA,ALBERT G.; THORNTON,R.L.; DONALDSON,R.D.

    1999-12-17

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible with virtually infinite expected lifetime at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs itself depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approx}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs, unlike a switch with conventional contacts. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  17. Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

    NASA Technical Reports Server (NTRS)

    Malik, R. J.; Nottenberg, R. N.; Schubert, E. F.; Walker, J. F.; Ryan, R. W.

    1988-01-01

    Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament. Controlled carbon acceptor concentrations over the range of 10 to the 17th-10 to the 20th/cu cm were achieved by resistively heating a graphite filament with a direct current power supply. Capacitance-voltage, p/n junction and secondary-ion mass spectrometry measurements indicate that there is negligible diffusion of carbon during growth and with postgrowth rapid thermal annealing. Carbon was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors. Current gains greater than 100 and near-ideal emitter heterojunctions were obtained in transistors with a carbon base doping of 1 x 10 to the 19th/cu cm. These preliminary results indicate that carbon doping from a solid graphite source may be an attractive substitute for beryllium, which is known to have a relatively high diffusion coefficient in GaAs.

  18. Passive Q-switching with GaAs or Bi-doped GaAs saturable absorber in Tm:LuAG laser operating at 2μm wavelength.

    PubMed

    Wu, Lin; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Wang, Reng; Liu, Ji

    2015-06-15

    We report the first demonstration of a diode pumped passively Q-switched Tm:LuAG laser near 2μm wavelength with Bi-doped or undoped GaAs wafer as saturable absorber. For Bi-doped GaAs saturable absorber, stable Q-switched pulses with duration of 63.3ns under a repetition rate of 132.7 kHz and pulse energy of 5.51μJ are generated. In comparison to the passively Q-switched laser with undoped GaAs saturable absorber, the laser with Bi-doped GaAs can produce shorter pulses and higher peak power at almost the same incident pump power. The results suggest that Bi-doped GaAs can be an attractive candidate of saturable absorber for Q-switched laser near 2μm wavelength.

  19. Optical properties of heavily doped GaAs nanowires and electroluminescent nanowire structures.

    PubMed

    Lysov, A; Offer, M; Gutsche, C; Regolin, I; Topaloglu, S; Geller, M; Prost, W; Tegude, F-J

    2011-02-25

    We present GaAs electroluminescent nanowire structures fabricated by metal organic vapor phase epitaxy. Electroluminescent structures were realized in both axial pn-junctions in single GaAs nanowires and free-standing nanowire arrays with a pn-junction formed between nanowires and substrate, respectively. The electroluminescence emission peak from single nanowire pn-junctions at 10 K was registered at an energy of around 1.32 eV and shifted to 1.4 eV with an increasing current. The line is attributed to the recombination in the compensated region present in the nanowire due to the memory effect of the vapor-liquid-solid growth mechanism. Arrayed nanowire electroluminescent structures with a pn-junction formed between nanowires and substrate demonstrated at 5 K a strong electroluminescence peak at 1.488 eV and two shoulder peaks at 1.455 and 1.519 eV. The main emission line was attributed to the recombination in the p-doped GaAs. The other two lines correspond to the tunneling-assisted photon emission and band-edge recombination in the abrupt junction, respectively. Electroluminescence spectra are compared with the micro-photoluminescence spectra taken along the single p-, n- and single nanowire pn-junctions to find the origin of the electroluminescence peaks, the distribution of doping species and the sharpness of the junctions.

  20. Zn-doping of GaAs nanowires grown by Aerotaxy

    NASA Astrophysics Data System (ADS)

    Yang, Fangfang; Messing, Maria E.; Mergenthaler, Kilian; Ghasemi, Masoomeh; Johansson, Jonas; Wallenberg, L. Reine; Pistol, Mats-Erik; Deppert, Knut; Samuelson, Lars; Magnusson, Martin H.

    2015-03-01

    Nanowires were grown by means of a novel aerosol-based method called Aerotaxy. Here an aerosol of Au catalyst nanoparticles in N2 is mixed with MOVPE precursors in a flow-through reactor at atmospheric pressure, whereby nanowires are produced continuously in high concentrations. We demonstrate the possibility of in situ doping of the NWs and the realization of well-controlled p-type GaAs nanowires using this Aerotaxy method. By controlling the cracking and concentration of the precursors, p-doped GaAs nanowires could be grown exhibiting a wide range of Zn doping levels. DEZn was used as the dopant source and the injected DEZn/TMGa ratio was varied from 0.1% to 3.4%. The morphology, the crystalline structure and the composition of the nanowires were studied using SEM, TEM and XEDS. The nanowires were grown straight without any significant tapering and this ideal morphology could be maintained up to an injected DEZn/TMGa ratio of 3.4%. The nanowires typically grew in the <111> direction with a pure zincblende structure, but by increasing the DEZn flow the number of twinning defects increased which we ascribe to Zn incorporation. Elemental analysis shows a high Zn content in the catalyst particle and also a gradient in the Zn content along the nanowire. The samples were analyzed optically using photoluminescence (PL). From the result we estimated the free hole concentration induced by Zn acceptors to be 1×1020 cm-3 for DEZn/TMGa ratio of 3.4%. To our knowledge this is the first report on in situ doping of GaAs nanowires grown by Aerotaxy.

  1. EL2 distributions in doped and undoped liquid encapsulated Czochralski GaAs. [deep donor concentration

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Yang, J.

    1983-01-01

    The longitudinal and radial distributions of EL2 in undoped semi-insulating and intentionally doped n-type GaAs crystals grown by the liquid encapsulated Czochralski technique are compared. Longitudinal profiles in undoped crystals are controlled by changes in melt stoichiometry as the crystal is pulled from the melt. EL2 profiles along crystals doped above about 1 x 10 to the 17th/cu cm, on the other hand, are controlled primarily by the carrier concentration as a result of the suppression of EL2 by free electrons. Radial EL2 profiles are typically W shaped and M shaped in undoped and doped (above threshold) crystals, respectively. The origin of these radial profiles is discussed in terms of residual stress, melt stoichiometry, and the suppresion of EL2 by electrons. The results are also discussed in the light of the antisite model for EL2.

  2. EL2 distributions in doped and undoped liquid encapsulated Czochralski GaAs. [deep donor concentration

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Yang, J.

    1983-01-01

    The longitudinal and radial distributions of EL2 in undoped semi-insulating and intentionally doped n-type GaAs crystals grown by the liquid encapsulated Czochralski technique are compared. Longitudinal profiles in undoped crystals are controlled by changes in melt stoichiometry as the crystal is pulled from the melt. EL2 profiles along crystals doped above about 1 x 10 to the 17th/cu cm, on the other hand, are controlled primarily by the carrier concentration as a result of the suppression of EL2 by free electrons. Radial EL2 profiles are typically W shaped and M shaped in undoped and doped (above threshold) crystals, respectively. The origin of these radial profiles is discussed in terms of residual stress, melt stoichiometry, and the suppresion of EL2 by electrons. The results are also discussed in the light of the antisite model for EL2.

  3. Long-lived electron spins in a modulation doped (100) GaAs quantum well

    NASA Astrophysics Data System (ADS)

    Colton, John; Meyer, David; Clark, Ken; Craft, Daniel; Tanner, Jane; Park, Tyler; White, Phil

    2013-03-01

    We have measured T1 spin lifetimes of a 14 nm modulation-doped (100) GaAs quantum well using a time-resolved pump-probe Kerr rotation technique. The quantum well was selected by tuning the wavelength of the probe laser. T1 lifetimes in excess of 1 microsecond were measured at 1.5 K and 5.5 T, exceeding the typical T2* lifetimes that have been measured in GaAs and II-VI quantum wells by orders of magnitude. We observed effects from nuclear polarization, which were largely removable by simultaneous nuclear magnetic resonance, along with two distinct lifetimes under some conditions that likely result from probing two differently-localized subsets of electrons.

  4. Long-lived electron spins in a modulation doped (100) GaAs quantum well

    NASA Astrophysics Data System (ADS)

    Colton, J. S.; Meyer, D.; Clark, K.; Craft, D.; Cutler, J.; Park, T.; White, P.

    2012-10-01

    We have measured T1 spin lifetimes of a 14 nm modulation-doped (100) GaAs quantum well using a time-resolved pump-probe Kerr rotation technique. The quantum well was selected by tuning the wavelength of the probe laser. T1 lifetimes in excess of 1 μs were measured at 1.5 K and 5.5 T, exceeding the typical T2* lifetimes that have been measured in GaAs and II-VI quantum wells by orders of magnitude. We observed effects from nuclear polarization, which were largely removable by simultaneous nuclear magnetic resonance, along with two distinct lifetimes under some conditions that likely result from probing two differently localized subsets of electrons.

  5. Effects of gold diffusion on n-type doping of GaAs nanowires.

    PubMed

    Tambe, Michael J; Ren, Shenqiang; Gradecak, Silvija

    2010-11-10

    The deposition of n-GaAs shells is explored as a method of n-type doping in GaAs nanowires grown by the Au-mediated metal-organic chemical vapor deposition. Core-shell GaAs/n-GaAs nanowires exhibit an unintended rectifying behavior that is attributed to the Au diffusion during the shell deposition based on studies using energy dispersive X-ray spectroscopy, current-voltage, capacitance-voltage, and Kelvin probe force measurements. Removing the gold prior to n-type shell deposition results in the realization of n-type GaAs nanowires without rectification. We directly correlate the presence of gold impurities to nanowire electrical properties and provide an insight into the role of seed particles on the properties of nanowires and nanowire heterostructures.

  6. Electron Excess Doping and Effective Schottky Barrier Reduction on the MoS2/h-BN Heterostructure.

    PubMed

    Joo, Min-Kyu; Moon, Byoung Hee; Ji, Hyunjin; Han, Gang Hee; Kim, Hyun; Lee, Gwanmu; Lim, Seong Chu; Suh, Dongseok; Lee, Young Hee

    2016-10-12

    Layered hexagonal boron nitride (h-BN) thin film is a dielectric that surpasses carrier mobility by reducing charge scattering with silicon oxide in diverse electronics formed with graphene and transition metal dichalcogenides. However, the h-BN effect on electron doping concentration and Schottky barrier is little known. Here, we report that use of h-BN thin film as a substrate for monolayer MoS2 can induce ∼6.5 × 10(11) cm(-2) electron doping at room temperature which was determined using theoretical flat band model and interface trap density. The saturated excess electron concentration of MoS2 on h-BN was found to be ∼5 × 10(13) cm(-2) at high temperature and was significantly reduced at low temperature. Further, the inserted h-BN enables us to reduce the Coulombic charge scattering in MoS2/h-BN and lower the effective Schottky barrier height by a factor of 3, which gives rise to four times enhanced the field-effect carrier mobility and an emergence of metal-insulator transition at a much lower charge density of ∼1.0 × 10(12) cm(-2) (T = 25 K). The reduced effective Schottky barrier height in MoS2/h-BN is attributed to the decreased effective work function of MoS2 arisen from h-BN induced n-doping and the reduced effective metal work function due to dipole moments originated from fixed charges in SiO2.

  7. Photoluminescence of individual doped GaAs /AlGaAs nanofabricated quantum dots

    NASA Astrophysics Data System (ADS)

    Kalliakos, Sokratis; García, César Pascual; Pellegrini, Vittorio; Zamfirescu, Marian; Cavigli, Lucia; Gurioli, Massimo; Vinattieri, Anna; Pinczuk, Aron; Dennis, Brian S.; Pfeiffer, Loren N.; West, Ken W.

    2007-04-01

    Dilute arrays of GaAs /AlGaAs modulation-doped quantum dots with same sizes fabricated by electron beam lithography and low impact reactive ion etching exhibit highly uniform luminescence lines. Single quantum dots display spectral emission with peak energies and linewidths linked largely to the geometrical diameter of the dot and to the built-in electron population. Multicharged excitonic and biexcitonic emission intensities have activation energy of about 2meV. These results highlight the potential of high quality nanofabricated quantum dots for applications in areas that require fine control of optical emission.

  8. Inhibition of Te surfactant effect on surface morphology of heavily Te-doped GaAs

    NASA Astrophysics Data System (ADS)

    Paquette, Bernard; Ilahi, Bouraoui; Aimez, Vincent; Arès, Richard

    2013-11-01

    The surface morphology and incorporation behavior of heavily Te-doped GaAs were studied for various growth parameters by chemical beam epitaxy (CBE). The Te precursor, DIPTe (diisopropyl telluride), acts as a volatile dopant in the growth temperature range of 475-595 °C. Electrical activation of Te is increased for lower growth temperatures. The Te surfactant effect was shown to lead to three-dimensional growth, which greatly affected the resulting surface morphology. We have shown that growth parameters can be tuned to reduce the Te surfactant effect through kinetic limitation, thus obtaining improved surface morphologies.

  9. Dependences of the electrical properties on the diameter and the doping concentration of the Si nanowire field effect transistors with a Schottky metal-semiconductor contact.

    PubMed

    You, Joo Hyung; Lee, Se Han; You, Chan Ho; Yu, Yun Seop; Kim, Tae Whan

    2010-05-01

    A compact model of the current-voltage (I-V) characteristics for the Si nanowire field effect transistor (FET) taking into account dependence of the analytical electrical properties on the diameter and the concentration of the Si nanowire of the FETs with a Schottky metal-semiconductor contact has been proposed. I-V characteristics of the nanowire FETs were analytically calculated by using a quantum drift-diffusion current transport model taking into account an equivalent circuit together with the quantum effect of the Si nanowires and a Schottky model at Schottky barriers. The material parameters dependent on different diameters and concentrations of the Si nanowire were numerically estimated from the physical properties of the Si nanowire. The threshold voltage, the mobility, and the doping density of the Si nanowire and the Schottky barrier height at a metal-Si nanowire heterointerface in the nanowire FET were estimated by using the theoretical model.

  10. Submillimeter wave GaAs Schottky diode application based study and optimization for 0.1-1.5 THz

    NASA Astrophysics Data System (ADS)

    Jenabi, Sarvenaz; Malekabadi, Ali; Deslandes, Dominic; Boone, Francois; Charlebois, Serge A.

    2017-08-01

    In this paper, a design and optimization method for submillimeter-wave Schottky diode is proposed. Parasitic capacitance is significantly reduced to under 20% of the total capacitance of the diode. The parasitic capacitance value is measured to be 0.6 fF for 1 μm anode radius which increased the cut-off frequency to 1.5 THz. A corresponding microfabrication process that provides higher degrees of freedom for the anode diameter, air-bridge dimensions and distance to the substrate is introduced and implemented. The DC and RF measurements are provided and compared with the simulations. In order to provide a better understanding of the diode behavior, the limiting factors of the cut-off frequency for different applications are studied and compared. For the mixer/multiplier mode, an improved and expanded formulation for calculation of the cut-off frequency is introduced. It is shown that the usable voltage bias range (with acceptable cut-off frequency) is limited by the exponential reduction of junction resistance, Rj , in mixer/multiplier mode.

  11. Interdigital Schottky barrier capacitor apparatus

    NASA Astrophysics Data System (ADS)

    Bierig

    1985-05-01

    The present invention relates broadly to Schottky barrier capacitors, and in particular to an interdigital Schottky barrier capacitor apparatus. In the prior art, the Schottky barrier diode is rather well known. In general, a Schottky barrier device comprises a semiconductor substrate layer that is formed by a first layer of heavily doped materials and a second layer of lightly doped materials upon which a layer of barrier metal is deposited thereon. The maximum reverse bias voltage which can be appplied to the Schottky barrier device is determined by the thickness of the lightly doped layer of semiconductive material which is deposited upon the substrate layer. This is only one of the factors that determined the reverse bias voltage, When a guardring is diffused into the lightly doped layer of semiconductive substrate material, the thickness of the layer is reduced, and therefore, the reverse bias voltage that can be applied to the Schottky device is reduced.

  12. The current–voltage and capacitance–voltage characteristics at high temperatures of Au Schottky contact to n-type GaAs

    SciTech Connect

    Özerli, Halil; Karteri, İbrahim; Karataş, Şükrü; Altindal, Şemsettin

    2014-05-01

    Highlights: • The electronic parameters of the diode under temperature were investigated. • The barrier heights have a Gaussian distribution. • Au/n-GaAs diode exhibits a rectification behavior. - Abstract: We have investigated the temperature-dependent current–voltage (I–V) and capacitance–voltage (C–V) characteristics of Au/n-GaAs Schottky barrier diodes (SBDs) in the temperature range of 280–415 K. The barrier height for the Au/n-type GaAs SBDs from the I–V and C–V characteristics have varied from 0.901 eV to 0.963 eV (I–V) and 1.234 eV to 0.967 eV (C–V), and the ideality factor (n) from 1.45 to 1.69 in the temperature range 280–415 K. The conventional Richardson plots are found to be linear in the temperature range measured. Both the ln(I{sub 0}/T{sup 2}) versus (kT){sup −1} and ln(I{sub 0}/T{sup 2}) versus (nkT){sup −1} plots gives a straight line corresponding to activation energies 0.773 eV and 0.870 eV, respectively. A Φ{sub b0} versus 1/T plot was drawn to obtain evidence of a Gaussian distribution of the BHs, and values of Φ{sup ¯}{sub b0} = 1.071 eV and σ{sub 0} = 0.094 V for the mean BH and zero-bias standard deviation have been obtained from this plot.

  13. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    Baca, A.G.; Brown, D.J.; Donaldson, R.D.; Helgeson, W.D.; Hjalmarson, H.P.; Loubriel, G.M.; Mar, A.; O'Malley, M.W.; Thornton, R.L.; Zutavern, F.J.

    1999-08-05

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  14. Improved short-channel GaAs MESFET's by use of higher doping concentration

    NASA Astrophysics Data System (ADS)

    Daembkes, H.; Brockerhoff, W.; Heime, K.; Cappy, A.

    1984-08-01

    GaAs MESFET's with highly doped channels up to 5 x 10 to the 18th per cu cm and with both micrometer and submicrometer gates were fabricated and evaluated. FET's with 1.2 micron gates show an extrinsic transconductance of more than 250 mS/mm, cutoff frequencies around 20 GHz, and a noise figure of 2 dB at 8 GHz with 9-dB associated gain. Breakdown voltage is higher than 6 V. FET's with 1.2- and 0.4-micron gates were simultaneously fabricated on the same wafer to investigate short-channel effects. The short-channel devices show a good saturation behavior and no shift in the threshold voltage compared to the long-channel devices thus demonstrating a pronounced alleviation of short-channel effects as experienced for 1 x 10 to the 17th per cu cm doping levels. The influence of doping concentration on the performance of devices with micrometer and submicrometer gates upon doping concentration is investigated by detailed computer simulations. Good agreement between theoretical and experimental results is obtained. From these results improved technological approaches are pointed out.

  15. Nonvolatile multibit Schottky memory based on single n-type Ga doped CdSe nanowires.

    PubMed

    Wu, Di; Jiang, Yang; Yu, Yongqiang; Zhang, Yugang; Li, Guohua; Zhu, Zhifeng; Wu, Chunyan; Wang, Li; Luo, Linbao; Jie, Jiansheng

    2012-12-07

    Nonvolatile resistive switching has been observed for the first time in CdSe nanowire (NW)/Au Schottky barrier diodes, where a Schottky contact electrode and an Ohmic contact electrode were formed at the Au/CdSe NW and CdSe NW/In interfaces, respectively. The CdSe NWs Schottky devices were found to possess multibit storage ability in an individual nanowire, and exhibited excellent memory characteristics, with a resistance on/off ratio exceeding four orders of magnitude, a long retention time of over 10(4) s and a lower operating voltage of 2 V. By replacing the SiO(2)/Si substrate with a poly ethylene terephthalate substrate, flexible and transparent memory devices with superior stability under strain were realized. The resistive switching of CdSe NW/Au Schottky devices is understood by electron trapping and detrapping in the interfacial oxide layer. Our findings provide a viable way to create new functional high-density nonvolatile multibit memory devices compatible with simple processing techniques for normal one-dimensional nanomaterials.

  16. Nonvolatile multibit Schottky memory based on single n-type Ga doped CdSe nanowires

    NASA Astrophysics Data System (ADS)

    Wu, Di; Jiang, Yang; Yu, Yongqiang; Zhang, Yugang; Li, Guohua; Zhu, Zhifeng; Wu, Chunyan; Wang, Li; Luo, Linbao; Jie, Jiansheng

    2012-12-01

    Nonvolatile resistive switching has been observed for the first time in CdSe nanowire (NW)/Au Schottky barrier diodes, where a Schottky contact electrode and an Ohmic contact electrode were formed at the Au/CdSe NW and CdSe NW/In interfaces, respectively. The CdSe NWs Schottky devices were found to possess multibit storage ability in an individual nanowire, and exhibited excellent memory characteristics, with a resistance on/off ratio exceeding four orders of magnitude, a long retention time of over 104 s and a lower operating voltage of 2 V. By replacing the SiO2/Si substrate with a poly ethylene terephthalate substrate, flexible and transparent memory devices with superior stability under strain were realized. The resistive switching of CdSe NW/Au Schottky devices is understood by electron trapping and detrapping in the interfacial oxide layer. Our findings provide a viable way to create new functional high-density nonvolatile multibit memory devices compatible with simple processing techniques for normal one-dimensional nanomaterials.

  17. GaAs microcrystals selectively grown on silicon: Intrinsic carbon doping during chemical beam epitaxy with trimethylgallium

    NASA Astrophysics Data System (ADS)

    Molière, T.; Jaffré, A.; Alvarez, J.; Mencaraglia, D.; Connolly, J. P.; Vincent, L.; Hallais, G.; Mangelinck, D.; Descoins, M.; Bouchier, D.; Renard, C.

    2017-01-01

    The monolithic integration of III-V semiconductors on silicon and particularly of GaAs has aroused great interest since the 1980s. Potential applications are legion, ranging from photovoltaics to high mobility channel transistors. By using a novel integration method, we have shown that it is possible to achieve heteroepitaxial integration of GaAs crystals (typical size 1 μ m) on silicon without any structural defect such as antiphase domains, dislocations, or stress, usually reported for direct GaAs heteroepitaxy on silicon. However, concerning their electronic properties, conventional free carrier characterization methods are impractical due to the micrometric size of GaAs crystals. In order to evaluate the GaAs material quality for optoelectronic applications, a series of indirect analyses such as atom probe tomography, Raman spectroscopy, and micro-photoluminescence as a function of temperature were performed. These revealed a high content of partially electrically active carbon originating from the trimethylgallium used as the Ga precursor. Nevertheless, the very good homogeneity observed by this doping mechanism and the attractive properties of carbon as a dopant once controlled to a sufficient degree are a promising route to device doping.

  18. Depth uniformity of electrical properties and doping limitation in neutron-transmutation-doped semi-insulating GaAs

    SciTech Connect

    Satoh, M.; Kuriyama, K. ); Kawakubo, T. )

    1990-04-01

    Depth uniformity of electrical properties has been evaluated for neutron-transmutation-doped (NTD), semi-insulating GaAs irradiated with thermal neutrons of 1.5{times}10{sup 18} cm{sup {minus}2} by the van der Pauw method combined with iterative etching of the surface. In NTD-GaAs wafers (thickness {similar to}410 {mu}m) annealed for 30 min at 700 {degree}C, the depth profiles of the resistivity, the carrier concentration, and the Hall mobility show constant values of 1{times}10{sup {minus}2} {Omega} cm, 2.0{times}10{sup 17} cm{sup {minus}3}, and 3100 cm{sup 2}/V s, respectively, within an experimental error of 5%. In an annealing process, the redistribution and/or the segregation of NTD impurities is not observed. We also discuss the limitations of low-level NTD in semi-insulating GaAs. It is suggested that the activation of the NTD-impurities below {similar to}1{times}10{sup 16} cm{sup {minus}3} is mainly restricted by the presence of the midgap electron trap (EL2).

  19. Effect of doped substrates on the growth of GaAs nanowires via metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Liu, Yan; Peng, Yan; Guo, Jingwei; La, Dongsheng; Xu, Zhaopeng; Wang, Haiyan

    2017-08-01

    Vertical GaAs nanowires were grown on different doped substrates via Metal Organic Chemical Vapor Deposition by catalyst assisted vapor-liquid-solid mechanism. It is found that both n and p type doped substrates affect catalyst distribution during the formation of alloy catalysts. The catalyst density decreases with an increase in the doping concentration of the substrates. In the growth of GaAs nanowires, the growth rate, which is mostly determined by the atoms diffusion from the pyrolysis of precursors on the surface of nanowires and substrates, is proportional to the catalyst densities. Moreover, the structures of as-grown nanowires are all pure zinc blende without any defects. These results will be valuable for the applications of nanowire-based optical and electrical devices.

  20. Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer

    SciTech Connect

    Shim, Seong Hoon; Kim, Hyung-jun; Koo, Hyun Cheol; Lee, Yun-Hi; Chang, Joonyeon

    2015-09-07

    We study spin accumulation in n-doped GaAs that were electrically injected from Fe via MgO using three-terminal Hanle measurement. The Fe/MgO/GaAs structures were prepared in a cluster molecular beam epitaxy that did not require the breaking of the vacuum. We found the crystal orientation relationship of epitaxial structures Fe[100]//MgO[110]//GaAs[110] without evident defects at the interface. Control of depletion width and interface resistance by means of modulation doping improves spin injection, leading to enhanced spin voltage (ΔV) of 6.3 mV at 10 K and 0.8 mV even at 400 K. The extracted spin lifetime and spin diffusion length of GaAs are 220 ps and 0.77 μm, respectively, at 200 K. MgO tunnel barrier grown in situ with modulation doping at the interface appears to be promising for spin injection into GaAs.

  1. Influence of stoichiometry and doping on vacancies in n-type GaAs

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Lausmann, M.; Redmann, F.; Krause-Rehberg, R.

    1999-12-01

    Native vacancies in n-type, Te-doped GaAs (n=5×1016-5×1018 cm-3) were studied by means of positron annihilation. We investigated the influence of doping, thermal treatment, and stoichiometry adjusted by changing the As pressure during annealing. Negatively charged monovacancies were found in all Te-doped samples under investigation. By using positron lifetime spectroscopy in conjunction with measurements of the annihilation momentum distribution and theoretical calculations, they can directly be identified to be VGa-TeAs complexes. After thermal treatment at 1100°C the density of the vacancies cv increases with the As pressure (pAs) like cv=0.1cdp1/4As where cd is the donor concentration. For such a treatment, cv depends only on pAs but not on the thermal history. The vacancy concentration was found to increase slightly with decreasing annealing temperature at a given pAs. This can be explained by the so-called Fermi level effect, i.e. the dependence of the equilibrium concentration of charged point defects on the position of the Fermi level.

  2. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires.

    PubMed

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R; Davis, Jeffrey A; Wang, Yuda; Smith, Leigh M; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-06-17

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  3. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-06-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  4. Influence of photoexcitation on hopping conduction in neutron-transmutation-doped GaAs

    SciTech Connect

    Satoh, M.; Kawahara, H.; Kuriyama, K.; Kawakubo, T.; Yoneda, K.; Kimura, I.

    1988-02-15

    The nature of the tunneling-assisted hopping conduction in neutron-transmutation-doped GaAs has been studied under photoexcitation with a photon energy of 1.32 eV. It is found that the dopants activated by annealing around 400 /sup 0/C provide the electrons to the defect levels originating the hopping conduction even when under photoexcitation. The hopping conduction under photoexcitation is affected by quenching in photoconductance below 120 K concerned with the main electron trap (EL2) and/or the As antisite defect (As/sub Ga/) induced by the neutron irradiation. The photoconductance of the samples with a lower radiation damage, As/sub Ga/less than or equal to1 x 10/sup 18/ cm/sup -3/, consists of the coexistence of the hopping and band conductions.

  5. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    PubMed Central

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-01-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  6. Optical absorption by free holes in heavily doped GaAs

    NASA Technical Reports Server (NTRS)

    Huberman, M. L.; Ksendzov, A.; Larsson, A.; Terhune, R.; Maserjian, J.

    1991-01-01

    Optical absorption in p-type GaAs with hole concentrations between 10 exp 19 and 10 exp 20/cu cm has been measured for wavelengths between 2 and 20 microns and compared with results of theoretical calculations. In contrast to previous measurements at lower doping levels, the occupied hole states are far from the zone center, where the heavy- and light-hole bands become parallel. This gives rise to a large joint density of states for optical transitions. It is found that the overall magnitude of the observed absorption is explained correctly by the theory, with both the free-carrier (indirect) and the inter-valence-band (direct) transitions contributing significantly to the total absorption. The strength of the absorption (a about 20,000/cm for N(A) = 5 x 10 exp 19/cu cm) is attractive for long-wavelength infrared-detector applications.

  7. Optical absorption by free holes in heavily doped GaAs

    NASA Astrophysics Data System (ADS)

    Huberman, M. L.; Ksendzov, A.; Larsson, A.; Terhune, R.; Maserjian, J.

    1991-07-01

    Optical absorption in p-type GaAs with hole concentrations between 10 exp 19 and 10 exp 20/cu cm has been measured for wavelengths between 2 and 20 microns and compared with results of theoretical calculations. In contrast to previous measurements at lower doping levels, the occupied hole states are far from the zone center, where the heavy- and light-hole bands become parallel. This gives rise to a large joint density of states for optical transitions. It is found that the overall magnitude of the observed absorption is explained correctly by the theory, with both the free-carrier (indirect) and the inter-valence-band (direct) transitions contributing significantly to the total absorption. The strength of the absorption (a about 20,000/cm for N(A) = 5 x 10 exp 19/cu cm) is attractive for long-wavelength infrared-detector applications.

  8. High-Performance GaAs Nanowire Solar Cells for Flexible and Transparent Photovoltaics.

    PubMed

    Han, Ning; Yang, Zai-xing; Wang, Fengyun; Dong, Guofa; Yip, SenPo; Liang, Xiaoguang; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C

    2015-09-16

    Among many available photovoltaic technologies at present, gallium arsenide (GaAs) is one of the recognized leaders for performance and reliability; however, it is still a great challenge to achieve cost-effective GaAs solar cells for smart systems such as transparent and flexible photovoltaics. In this study, highly crystalline long GaAs nanowires (NWs) with minimal crystal defects are synthesized economically by chemical vapor deposition and configured into novel Schottky photovoltaic structures by simply using asymmetric Au-Al contacts. Without any doping profiles such as p-n junction and complicated coaxial junction structures, the single NW Schottky device shows a record high apparent energy conversion efficiency of 16% under air mass 1.5 global illumination by normalizing to the projection area of the NW. The corresponding photovoltaic output can be further enhanced by connecting individual cells in series and in parallel as well as by fabricating NW array solar cells via contact printing showing an overall efficiency of 1.6%. Importantly, these Schottky cells can be easily integrated on the glass and plastic substrates for transparent and flexible photovoltaics, which explicitly demonstrate the outstanding versatility and promising perspective of these GaAs NW Schottky photovoltaics for next-generation smart solar energy harvesting devices.

  9. Optical and surface properties of the in doped GaAs layer deposition using thermionic vacuum arc method.

    PubMed

    Pat, Suat; Özen, Soner; Şenay, Volkan; Korkmaz, Şadan; Şimşek, Veli

    2016-07-01

    A broadband optical transparent InGaAs semiconductor layer production of micron thicknesses was produced in only 75 s by thermionic vacuum arc (TVA) method at the first time. The optical and surface properties of the produced layers have been investigated. InGaAs structure is using in electronics and optoelectronics devices. The main advantage of TVA method is its fast deposition rate, without any loss in the quality of the films. Doping is a very simple and fast according to common production methods. InGaAs is an alloy of indium arsenide (InAs) and gallium arsenide (GaAs). InAs with (220) crystallographic direction and GaAs with (024)/(022) crystallographic directions were detected using by XRD analysis. GaAs and InAs are in the cubic and zinc blende crystal system, respectively. According to the transmittance spectra, sample has a broadband transparency in the range of 1000-3300 nm. According to results, defined TVA method for In doping to GaAs is proper fast and friendly method. SCANNING 38:297-302, 2016. © 2015 Wiley Periodicals, Inc.

  10. Two acceptor levels and hopping conduction in Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Kajikawa, Yasutomo

    2017-01-01

    By analysing the experimental data of the temperature-dependent Hall-effect measurements, an additional acceptor level has been confirmed to exist in Mn-doped p-GaAs besides the isolated substitutional Mn acceptor level. It is found that, in most of the investigated samples, the room-temperature hole concentration is governed by the additional acceptor level rather than the isolated substitutional Mn acceptor level. The concentration of the additional acceptor level is found to increase almost in proportion to the square of the concentration of the isolated substitutional Mn acceptors, suggesting that the additional acceptor level is related to Mn dimers. This suggests that the ferromagnetism observed in more heavily Mn-doped GaAs may be attributed to Mn clusters. For some of the samples in which the characteristic of nearest-neighbour hopping conduction in the substitutional Mn acceptor impurity band is evident, the hopping activation energy is deduced and is proved to increase in proportion to the cube root of the concentration of the substitutional Mn acceptors.

  11. Enhanced efficiency of graphene-silicon Schottky junction solar cells by doping with Au nanoparticles

    SciTech Connect

    Liu, X.; Zhang, X. W. Yin, Z. G.; Meng, J. H.; Gao, H. L.; Zhang, L. Q.; Zhao, Y. J.; Wang, H. L.

    2014-11-03

    We have reported a method to enhance the performance of graphene-Si (Gr/Si) Schottky junction solar cells by introducing Au nanoparticles (NPs) onto the monolayer graphene and few-layer graphene. The electron transfer between Au NPs and graphene leads to the increased work function and enhanced electrical conductivity of graphene, resulting in a remarkable improvement of device efficiency. By optimizing the initial thickness of Au layers, the power conversion efficiency of Gr/Si solar cells can be increased by more than three times, with a maximum value of 7.34%. These results show a route for fabricating efficient and stable Gr/Si solar cells.

  12. Crossover from negative to positive magnetoresistance in a Si delta-doped GaAs single quantum well

    NASA Astrophysics Data System (ADS)

    Lo, Shun-Tsung; Chen, Kuang Yao; Su, Yi-Chun; Liang, C.-T.; Chang, Y. H.; Kim, Gil-Ho; Wu, J.-Y.; Lin, Sheng-Di

    2010-07-01

    We have performed magnetoresistance measurements on a Si delta-doped GaAs single quantum well. With increasing temperature T, a crossover from negative magnetoresistance (NMR) to positive magnetoresistance (PMR) can be observed. Our experimental results suggest that such a crossover corresponds to a transition from variable range hopping regime to activated electron transport. This is also consistent with the measured non-monotonic carrier density dependence on T.

  13. Impact of defect distribution on IrOx/ZnO interface doping and Schottky barriers

    NASA Astrophysics Data System (ADS)

    Foster, Geoffrey M.; Gao, Hantian; Mackessy, Grace; Hyland, Alana M.; Allen, Martin W.; Wang, Buguo; Look, David C.; Brillson, Leonard J.

    2017-09-01

    We used depth-resolved cathodoluminescence spectroscopy (DRCLS) to measure the nature and spatial distribution of native point defects at Zn- and O-polar ZnO interfaces with iridium oxide (IrOx) and their impact on Schottky barrier formation. IrOx and other metal oxides exhibit higher Schottky barriers than their pure metal counterparts, consistent with wider depletion regions and potentially useful for ohmic contacts to p-type semiconductors. DRCLS with I-V and 1/C2-V barrier height and carrier profile measurements showed high zinc vacancy VZn and CuZn defect densities that compensate free carrier densities, increase depletion widths, and form higher effective barriers than Ir/ZnO contacts. Zn-polar versus O-polar ZnO interfaces with IrOx exhibit 40% higher VZn + CuZn interface segregation and lower carrier densities within a wider depletion region, accounting for the significantly higher (0.89 vs. 0.67 eV) barrier heights. Both the depth of VZn density segregation and the Zn-deficient layer thickness measured microscopically match the depletion width and applied electric fields comparable to spontaneous polarization fields across similar layers displaying analogous defect segregation. These results account for the difference in polarity-dependent segregation due to the electric field-driven diffusion of native defects near ZnO interfaces.

  14. Observations of exciton and carrier spin relaxation in Be doped p-type GaAs

    SciTech Connect

    Asaka, Naohiro; Harasawa, Ryo; Tackeuchi, Atsushi; Lu, Shulong; Dai, Pan

    2014-03-17

    We have investigated the exciton and carrier spin relaxation in Be-doped p-type GaAs. Time-resolved spin-dependent photoluminescence (PL) measurements revealed spin relaxation behaviors between 10 and 100 K. Two PL peaks were observed at 1.511 eV (peak 1) and 1.497 eV (peak 2) at 10 K, and are attributed to the recombination of excitons bound to neutral Be acceptors (peak 1) and the band-to-acceptor transition (peak 2). The spin relaxation times of both PL peaks were measured to be 1.3–3.1 ns at 10–100 K, and found to originate from common electron spin relaxation. The observed existence of a carrier density dependence of the spin relaxation time at 10–77 K indicates that the Bir-Aronov-Pikus process is the dominant spin relaxation mechanism.

  15. Temperature dependent electrical characteristics of Pt Schottky barriers fabricated on lightly and highly doped n-type 4H-SiC

    NASA Astrophysics Data System (ADS)

    Huang, Lingqin; Wang, Dejun

    2015-11-01

    The temperature dependent electronic characteristics of Pt Schottky barriers fabricated on lightly and relatively highly doped n-type 4H-SiC (1 × 1016 and 1 × 1018 cm-3) are comparatively investigated. It is found that the abnormal temperature dependence of barrier height and ideality factor estimated from the thermionic emission (TE) model for both lightly and highly doped samples could be successfully explained in terms of Gaussian distribution of inhomogeneous barrier heights. However, the estimated mean barrier height according to Gaussian distribution for the highly doped sample is much lower than the actual mean value from the capacitance-voltage (C-V) measurements. Interestingly, the values of barrier height from the thermionic field emission (TFE) model are found to be close to those from the C-V measurements, indicating that the TFE model is more appropriate to explain the electrical transport for the highly doped sample.

  16. Excitation and de-excitation mechanisms of Er-doped GaAs and AlGaAs

    NASA Astrophysics Data System (ADS)

    Elsaesser, David W.

    1992-12-01

    Electrical and optical characterization have been performed on GaAs and Al(x)Ga(1-x)As samples doped with Er either by ion implantation or during Molecular Beam Epitaxial (MBE) growth. Deep Level Transient Spectroscopy (DLTS) and Temperature-Dependent Hall Effect (TDH) measurements indicated the presence of two hole traps in Er-doped GaAs, at 35 and 360 meV above the valence band maximum. The former (shallower) center was thought to be due to Er substituting for a Ga atom (ErGa) and giving rise to an isoelectronic impurity potential. The second center was attributed to an Er atom occupying an interstitial position (Er(i)). Annealing studies performed on Er-implanted GaAs indicated that the ErGa center preferentially formed at higher annealing temperatures (greater than 850 C), with the Er(i) reaching a maximum concentration at an annealing temperature of around 750 C. Optical characterization performed by Photoluminescence (PL) measurements showed that the Er(i) center gave a much stronger Er-related intra-4f shell emission. Mechanisms for the excitation of the 4f shells of these two centers are discussed. Similar optically active Eri centers may be forming in AlGaAs.

  17. Low Dose Gamma Radiation Monitoring Through TiO{sub 2} Doped Lead Phthalocyanine (Pb-Pc) Based Schottky Device

    SciTech Connect

    Janu, Yojana; Gautam, Anil; Kumar, Manish; Prasad, Narottam; Deol, Y. S.; Roy, M. S.

    2008-04-23

    The concept of Organic thin film based solid-state dosimeters is relatively new and more effective. The organic conductor based solid-state dosimeter provides a mean for low cost, ease to fabricate and sensitive radiation sensor which can be employed as pocket dosimeter for army personals getting exposed to nuclear radiation while working in the radioactive environment This concept is being utilized here for monitoring the effect of nuclear radiation on our organic material based sandwiched devices. In the present communication, lead Phthalocyanine (PbPc) doped with TiO{sub 2} (5% by weight) is developed into the form of thin film structure. The developed ITO/PbPc: TiO{sub 2}/Ag Schottky device structure was characterized in terms of change in its electrical and optical properties before and after exposure to radiation Exposure to radiation imparts an accelerated decrease in forward bias current and capacitance characteristics reveal a linear relationship between dose v/s current behavior which supports its suitability as pocket dosimeter for the dose ranging from 50 mR to 800 mR.

  18. Growth of n-doped GaAs nanowires by Au-assisted metalorganic chemical vapor deposition: effect of flux rates of n-type dopants

    NASA Astrophysics Data System (ADS)

    Guo, Jingwei; Huang, Hui; Liu, Minjia; Ren, Xiaomin; Cai, Shiwei; Wang, Wei; Wang, Qi; Huang, Yongqing; Zhang, Xia

    2010-12-01

    N-doped GaAs nanowires (NWs) were grown on GaAs (111) B substrate by means of vapor-liquid-solid (VLS) mechanism in a metalorganic chemical vapor deposition (MOCVD) system. Two flux rates of n-type dopants used for GaAs NWs growth were researched. For comparison, undoped GaAs NWs were grown at the same conditions. It is found that all NWs are vertical to the substrate and no lateral growth occurs. The growth rate is proportional the flux rates of n dopant. It is observed that there is Gibbs-Thomson effect in doped NWs. Pure zinc blende structures without any stacking faults from bottom to top for all three samples were achieved.

  19. Enhancement of intensity-dependent absorption in InP and GaAs at 1.9 microns by doping

    NASA Technical Reports Server (NTRS)

    Li, N.-L.; Bass, M.; Swimm, R.

    1985-01-01

    It is pointed out that the study of intensity-dependent absorption (IDA) in general, and two-photon absorption (TPA), in particular, has suffered from experimental difficulties and inadequate theoretical models. Bass et al. (1979) could improve the experimental situation by making use of laser calorimetry to obtain directly the TPA coefficient of a medium with a high degree of sensitivity. In the present investigation, the employed technique has been used to study the effect of deep level dopants on IDA in InP and GaAs. It is found that the coefficient for IDA is strongly dependent on the presence of Fe in InP and Cr in GaAs. The conducted investigation had the objective to examine the effect of deep level impurities on IDA processes in InP and GaAs. Fe-doped InP and Cr-doped GaAs were compared with undoped crystals.

  20. Carbon doping for the GaAs base layer of Heterojunction Bipolar Transistors in a production scale MOVPE reactor

    NASA Astrophysics Data System (ADS)

    Brunner, F.; Bergunde, T.; Richter, E.; Kurpas, P.; Achouche, M.; Maaßdorf, A.; Würfl, J.; Weyers, M.

    2000-12-01

    In this work different approaches for carbon doping of GaAs in MOVPE are compared with respect to their growth- and device-related material properties. Doping levels up to 6×10 19 cm -3 and smooth surface morphologies are achieved with either intrinsically (TMG and AsH 3 or TMAs) or extrinsically (CBr 4) doped layers. Despite comparable structural and majority carrier properties differences in GaInP/GaAs-HBT device performance depending on base doping conditions are obtained. Devices with an intrinsically doped base layer (TMG+AsH 3) show superior transistor performance with a current gain to base sheet resistance ratio ( β/ Rsb) exceeding 0.5 for base thicknesses as large as 120 nm. The use of either CBr 4 or TMAs as base growth precursors results in reduced current gains ( β/ Rsb⩽0.3). It is shown that the achieved HBT current gain is directly related to recombination centers in the heavily doped base layer depending on doping method.

  1. Self-consistent calculations and design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph O.; Goradia, Chandra; Brinker, David

    1987-01-01

    The authors present design constraints which show that a previously proposed GaAs nipi doping superlattice solar cell structure would not work as an efficient space solar cell. A structure based on the CLEFT process, which shows promise of being an efficient cell with very high radiation tolerance, is proposed. In order to test theoretically its viability and to optimize its design, self-consistent quantum mechanical calculations were made for a number of thicknesses of the n, i, and p layers and the dopings in the n and p layers. These results show that: 1) an i layer is not necessary; in fact, its presence makes it difficult to satisfy one of the key constraints; 2) a near-optimum design with 750-A thick n and p layers with dopings of 2.5E18/cu cm and a selective contact separation of 20 microns would yield both high efficiency and very high radiation tolerance.

  2. Self-consistent calculations and design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph O.; Goradia, Chandra; Brinker, David

    1987-01-01

    The authors present design constraints which show that a previously proposed GaAs nipi doping superlattice solar cell structure would not work as an efficient space solar cell. A structure based on the CLEFT process, which shows promise of being an efficient cell with very high radiation tolerance, is proposed. In order to test theoretically its viability and to optimize its design, self-consistent quantum mechanical calculations were made for a number of thicknesses of the n, i, and p layers and the dopings in the n and p layers. These results show that: 1) an i layer is not necessary; in fact, its presence makes it difficult to satisfy one of the key constraints; 2) a near-optimum design with 750-A thick n and p layers with dopings of 2.5E18/cu cm and a selective contact separation of 20 microns would yield both high efficiency and very high radiation tolerance.

  3. Surface passivation of tellurium-doped GaAs nanowires by GaP: Effect on electrical conduction

    SciTech Connect

    Darbandi, A.; Salehzadeh, O.; Watkins, S. P.; Kuyanov, P.; LaPierre, R. R.

    2014-06-21

    We report on the surface passivation of Au-assisted Te-doped GaAs nanowires (NWs) grown by metalorganic vapor phase epitaxy. The electrical properties of individual free standing NWs were assessed using a tungsten nano-probe inside a scanning electron microscope. The diameter independent apparent resistivity of both strained and relaxed passivated NWs suggests the unpinning of the Fermi level and reduction of sidewalls surface states density. Similar current-voltage properties were observed for partially axially relaxed GaAs/GaP NWs. This indicates a negligible contribution of misfit dislocations in the charge transport properties of the NWs. Low temperature micro-photoluminescence (μ-PL) measurements were also carried out for both uncapped and passivated GaAs NWs. The improvement of the integrated (μ-PL) intensity for GaAs/GaP NWs further confirms the effect of passivation.

  4. Effects of rapid thermal annealing on two-dimensional delocalized electronic states of the epitaxial N δ-doped layer in GaAs

    SciTech Connect

    Ogawa, Yasuhiro; Harada, Yukihiro; Baba, Takeshi; Kaizu, Toshiyuki; Kita, Takashi

    2016-03-14

    We have conducted rapid thermal annealing (RTA) for improving the two-dimensional (2D) arrangement of electronic states in the epitaxial nitrogen (N) δ-doped layer in GaAs. RTA rearranged the N-pair configurations in the GaAs (001) plane and reduced the number of non-radiative recombination centers. Furthermore, a Landau shift, representing the 2D delocalized electronic states in the (001) plane, was observed at around zero magnetic field intensity in the Faraday configuration.

  5. An all-carbon vdW heterojunction composed of penta-graphene and graphene: Tuning the Schottky barrier by electrostatic gating or nitrogen doping

    NASA Astrophysics Data System (ADS)

    Guo, Yaguang; Wang, Fancy Qian; Wang, Qian

    2017-08-01

    The non-zero band gap together with other unique properties endows penta-graphene with potential for device applications. Here, we study the performance of penta-graphene as the channel material contacting with graphene to form a van der Waals heterostructure. Based on first-principles calculations, we show that the intrinsic properties of penta-graphene are preserved in the heterojunction, which is different from the conventional contact with metal surfaces. The stacked system forms an n-type Schottky barrier (Φe) at the vertical interface, while a negative band bending occurs at the lateral interface in a current-in-plane model. From the device point of view, we further demonstrate that a low-Φe or an Ohmic contact can be realized by applying an external electric field or doping graphene with nitrogen atoms. This allows the control of the Schottky barrier height, which is essential in fabricating penta-graphene-based nanotransistors.

  6. Emission-wavelength tuning of InAs quantum dots grown on nitrogen-δ-doped GaAs(001)

    SciTech Connect

    Kaizu, Toshiyuki; Taguchi, Kohei; Kita, Takashi

    2016-05-21

    We studied the structural and photoluminescence (PL) characteristics of InAs quantum dots (QDs) grown on nitrogen (N) δ-doped GaAs(001). The emission wavelength for low-density N-δ doping exhibited a blueshift with respect to that for undoped GaAs and was redshifted with increasing N-sheet density. This behavior corresponded to the variation in the In composition of the QDs. N-δ doping has two opposite and competing effects on the incorporation of Ga atoms from the underlying layer into the QDs during the QD growth. One is the enhancement of Ga incorporation induced by the lattice strain, which is due to the smaller radius of N atoms. The other is an effect blocking for Ga incorporation, which is due to the large bonding energy of Ga-N or In-N. At a low N-sheet density, the lattice-strain effect was dominant, while the blocking effect became larger with increasing N-sheet density. Therefore, the incorporation of Ga from the underlying layer depended on the N-sheet density. Since the In-Ga intermixing between the QDs and the GaAs cap layer during capping also depended on the size of the as-grown QDs, which was affected by the N-sheet density, the superposition of these three factors determined the composition of the QDs. In addition, the piezoelectric effect, which was induced with increased accumulation of lattice strain and the associated high In composition, also affected the PL properties of the QDs. As a result, tuning of the emission wavelength from 1.12 to 1.26 μm was achieved at room temperature.

  7. Optical power-driven electron spin relaxation regime crossover in Mn-doped bulk GaAs

    NASA Astrophysics Data System (ADS)

    Münzhuber, F.; Kiessling, T.; Ossau, W.; Molenkamp, L. W.; Astakhov, G. V.

    2015-09-01

    We demonstrate tunability of the electron spin lifetime in Mn-doped GaAs by purely optical means. The observed behavior stems from a crossover of the electron spin relaxation rate with increasing excitation density, first decreasing due to the exchange interaction of Mn bound holes with Mn ions, and then increasing again as the valence band is populated and Bir-Aranov-Pikus relaxation sets in. On this account, we explain the complex spatial spin polarization profiles emerging from inhomogeneous optical excitation, which are the result of the combined action of this nonmonotonic spin relaxation characteristics and the intricate photocarrier decay dynamics.

  8. Excitation and De-Excitation Mechanisms of Er-Doped GaAs and A1GaAs.

    DTIC Science & Technology

    1992-12-01

    laser, which operates on internal transitions in the unfilled 4f shell of the RE ion neodymium (Nd 3 +) in yttrium aluminum garnet (YAG = Y3Ah5O 1 2... operation , as well as a much smaller shift in the mode wavelength with temperature (,,hAPC) as compared to laser structures without Er-doping (,,5 APC...Techniques ......................................... 18 3.1. Hall Effect Measurements ................................... 18 3.1.1. Temperature

  9. Effect of Sb composition on the conduction type and photoluminescence of heavily Sn-doped GaAs1-xSbx

    NASA Astrophysics Data System (ADS)

    Sasaki, T.; Jinbo, Y.; Uchitomi, N.

    2006-09-01

    Heavily Sn-doped GaAs1-xSbx epitaxial films were grown on SI-GaAs (001) substrates by solid source molecular beam epitaxy. A 5 nm-thick AlSb buffer layer was employed to relax the lattice mismatch between the epilayer and the substrate. X-ray diffraction (XRD), Hall effect measurements and photoluminescence measurements were performed to characterize the epitaxial films. The heavily Sn-doped GaAs1-xSbx / AlSb films with x 0.24 indicated n-type conduction while the epitaxial films with x 0.43 indicated p-type conduction.

  10. A novel δ-doped partially insulated dopant-segregated Schottky barrier SOI MOSFET for analog/RF applications

    NASA Astrophysics Data System (ADS)

    Patil, Ganesh C.; Qureshi, S.

    2011-08-01

    In this paper, a comparative analysis of single-gate dopant-segregated Schottky barrier (DSSB) SOI MOSFET and raised source/drain ultrathin-body SOI MOSFET (RSD UTB) has been carried out to explore the thermal efficiency, scalability and analog/RF performance of these devices. A novel p-type δ-doped partially insulated DSSB SOI MOSFET (DSSB Pi-OX-δ) has been proposed to reduce the self-heating effect and to improve the high-frequency performance of DSSB SOI MOSFET over RSD UTB. The improved analog/RF figures of merit such as transconductance, transconductance generation factor, unity-gain frequency, maximum oscillation frequency, short-circuit current gain and unilateral power gain in DSSB Pi-OX-δ MOSFET show the suitability of this device for analog/RF applications. The reduced drain-induced barrier lowering, subthreshold swing and parasitic capacitances also make this device highly scalable. By using mixed-mode simulation capability of MEDICI simulator a cascode amplifier has been implemented using all the structures (RSD UTB, DSSB SOI and DSSB Pi-OX-δ MOSFETs). The results of this implementation show that the gain-bandwidth product in the case of DSSB Pi-OX-δ MOSFET has improved by 50% as compared to RSD UTB and by 20% as compared to DSSB SOI MOSFET. The detailed fabrication flow of DSSB Pi-OX-δ MOSFET has been proposed which shows that with the bare minimum of steps the performance of DSSB SOI MOSFET can be improved significantly in comparison to RSD UTB.

  11. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.

    2009-05-01

    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  12. The effect of doping on low temperature growth of high quality GaAs nanowires on polycrystalline films

    NASA Astrophysics Data System (ADS)

    DeJarld, Matt; Teran, Alan; Luengo-Kovac, Marta; Yan, Lifan; Moon, Eun Seong; Beck, Sara; Guillen, Cristina; Sih, Vanessa; Phillips, Jamie; Mirecki Milunchick, Joanna

    2016-12-01

    The increasing demand for miniature autonomous sensors requires low cost integration methods, but to date, material limitations have prevented the direct growth of optically active III-V materials on CMOS devices. We report on the deposition of GaAs nanowires on polycrystalline conductive films to allow for direct integration of optoelectronic devices on dissimilar materials. Undoped, Si-doped, and Be-doped nanowires were grown at Ts = 400 °C on oxide (indium tin oxide) and metallic (platinum and titanium) films. Be-doping is shown to significantly reduce the nanowire diameter and improve the nanowire aspect ratio to 50:1. Photoluminescence measurements of Be-doped nanowires are 1-2 orders of magnitude stronger than undoped and Si-doped nanowires and have a thermal activation energy of 14 meV, which is comparable to nanowires grown on crystalline substrates. Electrical measurements confirm that the metal-semiconductor junction is Ohmic. These results demonstrate the feasibility of integrating nanowire-based optoelectronic devices directly on CMOS chips.

  13. The effect of doping on low temperature growth of high quality GaAs nanowires on polycrystalline films.

    PubMed

    DeJarld, Matt; Teran, Alan; Luengo-Kovac, Marta; Yan, Lifan; Moon, Eun Seong; Beck, Sara; Guillen, Cristina; Sih, Vanessa; Phillips, Jamie; Milunchick, Joanna Mirecki

    2016-12-09

    The increasing demand for miniature autonomous sensors requires low cost integration methods, but to date, material limitations have prevented the direct growth of optically active III-V materials on CMOS devices. We report on the deposition of GaAs nanowires on polycrystalline conductive films to allow for direct integration of optoelectronic devices on dissimilar materials. Undoped, Si-doped, and Be-doped nanowires were grown at Ts  = 400 °C on oxide (indium tin oxide) and metallic (platinum and titanium) films. Be-doping is shown to significantly reduce the nanowire diameter and improve the nanowire aspect ratio to 50:1. Photoluminescence measurements of Be-doped nanowires are 1-2 orders of magnitude stronger than undoped and Si-doped nanowires and have a thermal activation energy of 14 meV, which is comparable to nanowires grown on crystalline substrates. Electrical measurements confirm that the metal-semiconductor junction is Ohmic. These results demonstrate the feasibility of integrating nanowire-based optoelectronic devices directly on CMOS chips.

  14. Physical property analysis of C-doped GaAs as function of the carrier concentration grown by MOCVD using elemental arsenic as precursor

    NASA Astrophysics Data System (ADS)

    Díaz-Reyes, J.; Avendaño, M. A.; Galván-Arellano, M.; Peña-Sierra, R.

    2006-03-01

    This work presents the characterization of GaAs layers grown in a metallic-arsenic-based-MOCVD system. The gallium precursor was the compound trimethylgallium (TMG) and elemental arsenic as precursor of arsenic. The most important parameters of the growth process include the substrate temperature and the composition of the carrier gas; an N2+H2 gas mixture. The influence of carbon doping on the optical and electrical properties of GaAs layers have been studied by photoluminescence (PL) spectroscopy, Photoreflectance (PR) and Hall Effect measurements. To carry out doping with carbon in the range of around 1016 to 1020 cm-3, it was necessary to modifying the hydrogen activity in the reacting atmosphere with the control of the N{2}+H{2}, mixture which was used as carrier gas. The PL response of the samples is strongly dependent on the growth temperature and showed mainly two radiative transitions, band-to-band and band-to C-acceptor. PR spectra present transitions associated to GaAs. Besides, short period oscillations near the GaAs band-gap energy are observed, interpreted as Franz-Keldysh oscillations associated to the hole-ionized acceptor (h-A-) pair modulations. For investigating the chemical bonds of impurity-related species in the GaAs layers optical absorption was measured using a FT-IR spectrometer. Device quality GaAs layers have been grown in a broad range of growth temperatures.

  15. Increased effective barrier heights in Schottky diodes by molecular-beam epitaxy of CoSi2 and Ga-doped Si on Si(111)

    NASA Technical Reports Server (NTRS)

    Fathauer, R. W.; Lin, T. L.; Grunthaner, P. J.; Andersson, P. O.; Iannelli, J. M.

    1988-01-01

    Increasing the effective Schottky-barrier height of epitaxial CoSi2/Si(111) diodes by the use of thin, highly doped Si layers in close proximity to the metal-semiconductor interface has been studied. Intrinsic Si, Si doped by coevaporation of Ga, and epitaxial CoSi2 layers have all been grown in the same molecular-beam epitaxy system. Current-voltage and photoresponse characterization yield barrier heights ranging from 0.61 eV for a sample with no p(+) layer to 0.89 eV for a sample with a 20-nm-thick p(+) layer. These results are compared to theoretical values based on a one-dimensional solution of Poisson's equation under the depletion approximation.

  16. Design of a W-band Frequency Tripler for Broadband Operation Based on a Modified Equivalent Circuit Model of GaAs Schottky Varistor Diode

    NASA Astrophysics Data System (ADS)

    Chen, Zhenhua; Xu, Jinping

    2013-01-01

    This paper presents the design and experimental results of a W-band frequency tripler with commercially available planar Schottky varistor diodes DBES105a fabricated by UMS, Inc. The frequency tripler features the characteristics of tunerless, passive, low conversion loss, broadband and compact. Considering actual circuit structure, especially the effect of ambient channel around the diode at millimeter wavelength, a modified equivalent circuit model for the Schottky diode is developed. The accuracy of the magnitude and phase of S21 of the proposed equivalent circuit model is improved by this modification. Input and output embedding circuits are designed and optimized according to the corresponding embedding impedances of the modified circuit model of the diode. The circuit of the frequency tripler is fabricated on RT/Rogers 5880 substrate with thickness of 0.127 mm. Measured conversion loss of the frequency tripler is 14.5 dB with variation of ±1 dB across the 75 ~ 103 GHz band and 15.5 ~ 19 dB over the frequency range of 103 ~ 110 GHz when driven with an input power of 18 dBm. A recorded maximum output power of 6.8 dBm is achieved at 94 GHz at room temperature. The minimum harmonics suppression is greater than 12dBc over 75 ~ 110 GHz band.

  17. GaInP/GaAs tandem solar cells with highly Te- and Mg-doped GaAs tunnel junctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Zheng, Xin-He; Liu, San-Jie; Xia, Yu; Gan, Xing-Yuan; Wang, Hai-Xiao; Wang, Nai-Ming; Yang, Hui

    2015-10-01

    We report a GaInP/GaAs tandem solar cell with a novel GaAs tunnel junction (TJ) with using tellurium (Te) and magnesium (Mg) as n- and p-type dopants via dual-filament low temperature effusion cells grown by molecular beam epitaxy (MBE) at low temperature. The test Te/Mg-doped GaAs TJ shows a peak current density of 21 A/cm2. The tandem solar cell by the Te/Mg TJ shows a short-circuit current density of 12 mA/cm2, but a low open-circuit voltage range of 1.4 V˜1.71 V under AM1.5 illumination. The secondary ion mass spectroscopy (SIMS) analysis reveals that the Te doping is unexpectedly high and its doping profile extends to the Mg doping region, thus possibly resulting in a less abrupt junction with no tunneling carriers effectively. Furthermore, the tunneling interface shifts from the intended GaAs n++/p++ junction to the AlGaInP/GaAs junction with a higher bandgap AlGaInP tunneling layers, thereby reducing the tunneling peak. The Te concentration of ˜ 2.5 × 1020 in GaAs could cause a lattice strain of 10-3 in magnitude and thus a surface roughening, which also negatively influences the subsequent growth of the top subcell and the GaAs contacting layers. The doping features of Te and Mg are discussed to understand the photovoltaic response of the studied tandem cell. Project supported by the SINANO-SONY Joint Program (Grant No. Y1AAQ11001), the National Natural Science Foundation of China (Grant No. 61274134), the USCB Start-up Program (Grant No. 06105033), and the International Cooperation Projects of Suzhou City, China (Grant No. SH201215).

  18. Three-fold Symmetric Doping Mechanism in GaAs Nanowires.

    PubMed

    Dastjerdi, M H T; Fiordaliso, E M; Leshchenko, E D; Akhtari-Zavareh, A; Kasama, T; Aagesen, M; Dubrovskii, V G; LaPierre, R R

    2017-10-11

    A new dopant incorporation mechanism in Ga-assisted GaAs nanowires grown by molecular beam epitaxy is reported. Off-axis electron holography revealed that p-type Be dopants introduced in situ during molecular beam epitaxy growth of the nanowires were distributed inhomogeneously in the nanowire cross-section, perpendicular to the growth direction. The active dopants showed a remarkable azimuthal distribution along the (111)B flat top of the nanowires, which is attributed to preferred incorporation along 3-fold symmetric truncated facets under the Ga droplet. A diffusion model is presented to explain the unique radial and azimuthal variation of the active dopants in the GaAs nanowires.

  19. Study and Analysis of AlGaAs/GaAs Modulation Doped Field-Effect Transistors Incorporating P-Type Schottky Gate Barriers.

    DTIC Science & Technology

    1985-12-01

    Doped Structures (Al Ga As/GaAs) and Correlation x -x with Monte Carlo Calculations (GaAs)," Applied Physics Letters 41(3):277 (1 August 1982). 12...Transistors," Applied Physics Letters 40:879-881 (15 May 1982). 13. Drummond, T., W. Kopp, M. Keever, H. Morkoc, and A. Cho. "Electron Mobility in...34Mobility of the Two-Dimensional Electron Gas in GaAs-AlGaAs Heterostructures," Applied Physics Letters 45:695-697, (15 Sep 1984). 37. Linh, N., P

  20. Persistent photoconductivity in uniforndy and selectively silicon doped AlAs / GaAs short period superlattices

    NASA Astrophysics Data System (ADS)

    Jeanjean, P.; Sicart, J.; Robert, J. L.; Mollot, F.; Planel, R.

    1991-04-01

    Hall and photo-Hall measurements have been carried out between 4 K et 400 K on MBE deposited AlAs / GaAs superiattices (SPS) with short period (25 Å < P < 50 Å) SPSs were uniformly or selectively doped with silicon. Galvanomagnetic measurements show that SPSs exhibited an electrical behaviour similar to that of AlxGal{1-x}As : Si alloy (0.32 < x < 0.35). The Hall mobility was increased under illumination and persistent photoconductivity (PPC) was observed at low temperature (DX center). Ibermal annealing of PPC was performed by increasing the measurement temperature. Two plateaus are observed in the n_H(T) curves in uniformly doped SPSs whereas only one plateau was present in selectively doped SPSs. These experimental results are interpreted in terms of the multibarrier model of the DX center recently proposed in AIxGal{1-x}As: Si. Nous présentons des résultats de mesures d'effet Hall et photo-Hall obtenus entre 4 K et 400 K dans des superréseaux AlAs / GaAs de courtes périodes (25 Å < P < 50 Å) déposées par MBE et dopées au silicium de manière uniforme ou sélectivement dans GaAs. Les mesures de concentration de porteurs et de mobilité par effet Hall à l'obscurité montrent que ce type de SPS (short period superiattice) présente un comportement électrique voisin de l'alliage AIxGal{1-x}As: Si de teneur en aluminium équivalente (0.32 < x < 0.35). Les mesures de photo-Hall à basse température montrent que ces SPS présentent également une photeconductivité persistente (PPC) et une augmentation de mobilité sous éclairement. La présence d'un plateau de PPC à basse temperature (T< 90 K) est caractéristique du centre métastable DX dans tous les cas. Des mesures de décroissance du nombre de porteurs mesurés à l'obscurité aprés éclairement quand la température augmente (capture thermique), mettent en évidence la présence de deux plateaux correspondant à deux barrières thermiques de l'état métastable du centre DX dans les SPS

  1. Factors influencing doping control and abrupt metallurgical transitions during atmospheric pressure MOVPE growth of AlGaAs and GaAs

    NASA Astrophysics Data System (ADS)

    Roberts, J. S.; Mason, N. J.; Robinson, M.

    1984-09-01

    Atmospheric pressure MOVPE of GaAs and AlGaAs has been investigated using two gas handling systems and a conventional horizontal reactor. Initially a simple source/carrier gas manifold design was assessed but severe retention of reagents in the pipework resulted in poor control of doping and interface abruptness. However, integration of the reagent and carrier gas in a pressure balanced vent/run configuration gave a significant improvement. AlGaAs/GaAs multilayers and n +/n - GaAs transitions have been used to assess the performance of both systems. Abrupt p-type doping transitions using bis-cyclopentadienylmagnesium proved unsuccessful as long doping tails were observed.

  2. In Situ Selected Area Doping of GaAs by Molecular Beam Epitaxy.

    DTIC Science & Technology

    1985-07-01

    utilized a multichambered, cyropumped, LN shrouded, homebuilt MBE apparatus. The MBE system consists of three chambers: a load-lock chamber, an antechamber... homebuilt apparatus. The three chambers consist of a * load-lock chamber for fast introduction of the GaAs substrate wafers into vacuum, an

  3. Design Issues of GaAs and AlGaAs Delta-Doped p-i-n Quantum-Well APD's

    NASA Technical Reports Server (NTRS)

    Wang, Yang

    1994-01-01

    We examine the basic design issues in the optimization of GaAs delta-doped and AlGAs delta-doped quantum-well avalanche photodiode (APD) structures using a theoretical analysis based on an ensemble Monte Carlo simulation. The devices are variations of the p-i-n doped quantum-well structure previously described in the literature. They have the same low-noise, high-gain and high-bandwidth features as the p-i-n doped quantum-well device. However, the use of delta doping provides far greater control or the doping concentrations within each stage possibly enhancing the extent to which the device can be depleted. As a result, it is expected that the proposed devices will operate at higher gain levels (at very low noise) than devices previously developed.

  4. Thermal annealing behavior of deep levels in Rh-doped n-type MOVPE GaAs

    NASA Astrophysics Data System (ADS)

    Naz, Nazir A.; Qurashi, Umar S.; Zafar Iqbal, M.

    2009-12-01

    We report the results of isochronal annealing study of deep levels in Rh-doped n-type GaAs grown by metal-organic vapor phase epitaxy (MOVPE). Deep level transient spectroscopy (DLTS) technique has been employed to study the effects of annealing on deep levels in Rh-doped p+nn+ junction samples. A majority-carrier emitting band of deep levels along with a high temperature peak (RhE1), corresponding to deep level energy position Ec-0.92 eV and a minority-carrier emitting band of deep levels are identified with Rh-impurity prior to thermal annealing of our samples. In addition to these Rh-related deep levels, the well-known native defect EL2 at Ec-0.79 eV is observed in majority-carrier emission spectra and two inadvertent deep-level defects, H1 at Ev+0.09 eV and H3 at Ev+0.93 eV, usually observed in reference (without Rh) samples, are also detected in the minority-carrier emission spectra of Rh-doped samples. At least one level is found to be introduced at Ec-0.13 eV in Rh-doped samples at about the same temperature position as the level E(A)1, observed in reference samples, as a result of isochronal annealing, while the other two levels observed in reference samples could not be seen in annealed Rh-doped samples. Data on the annealing behavior and other characteristics of both Rh-related bands of deep levels observed in majority- and minority-carrier emission DLTS spectra, as well as for the high temperature Rh-related electron-emission peak, are presented. Possible interpretations of these results for the nature and structure of the different deep-level defects are discussed.

  5. Comparison of OARE Accelerometer Data with Dopant Distribution in Se-Doped GaAs Crystals Grown During USML-1

    NASA Technical Reports Server (NTRS)

    Moskowitz, Milton E.; Bly, Jennifer M.; Matthiesen, David H.

    1997-01-01

    Experiments were conducted in the crystal growth furnace (CGF) during the first United States Microgravity Laboratory (USML-1), the STS-50 flight of the Space Shuttle Columbia, to determine the segregation behavior of selenium in bulk GaAs in a microgravity environment. After the flight, the selenium-doped GaAs crystals were sectioned, polished, and analyzed to determine the free carrier concentration as a function of position, One of the two crystals initially exhibited an axial concentration profile indicative of diffusion controlled growth, but this profile then changed to that predicted for a complete mixing type growth. An analytical model, proposed by Naumann [R.J. Naumann, J. Crystal Growth 142 (1994) 253], was utilized to predict the maximum allowable microgravity disturbances transverse to the growth direction during the two different translation rates used for each of the experiments. The predicted allowable acceleration levels were 4.86 microgram for the 2.5 micrometers/s furnace translation rate and 38.9 microgram for the 5.0 micrometers/s rate. These predicted values were compared to the Orbital Acceleration Research Experiment (OARE) accelerometer data recorded during the crystal growth periods for these experiments. Based on the analysis of the OARE acceleration data and utilizing the predictions from the analytical model, it is concluded that the change in segregation behavior was not caused by any acceleration events in the microgravity environment.

  6. Identifying and quantifying point defects in semiconductors using x-ray-absorption spectroscopy: Si-doped GaAs

    SciTech Connect

    Schuppler, S.; Adler, D.L.; Pfeiffer, L.N.; West, K.W.; Chaban, E.E.; Citrin, P.H.

    1995-04-15

    Both the type and concentration of point defects responsible for the observed poor electrical activity of highly Si-doped GaAs have been determined using near-edge and extended x-ray-absorption fine structure (NEXAFS and EXAFS). The measurements were made possible using a combination of synchrotron beamline features, fluorescence detection, and GaAs(311){ital A} samples. Because Si can occupy both {ital n}-type Ga and {ital p}-type As sites, the electrical deactivation has generally been attributed to acceptor-Si atoms trapping free-electron carriers. However, the present NEXAFS data directly measure upper limts on the concentration of Si atoms occupying such {ital p}-type As sites, showing that only about half of the observed electrical inactivity is due to this autocompensation mechanism. Identification of the dominant defects responsible for the additionally missing carriers is provided by the EXAFS data, which reveal a comparatively large number of neutral Si{sub Ga}-Si{sub As} dimers and small Si{sub {ital n}} clusters. Implications of these findings and a comparison with local vibrational mode spectroscopy and scanning tunneling microscopy methods are discussed.

  7. Photoreflectance analysis of annealed vanadium-doped GaAs thin films grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fitouri, H.; Bilel, C.; Zaied, I.; Bchetnia, A.; Rebey, A.; El Jani, B.

    2015-09-01

    In this study, we investigate the optical properties of annealed vanadium-doped GaAs films grown on GaAs substrates by metalorganic vapor phase epitaxy. The temperature dependence of the photoreflectance (PR) of as-grown GaAs:V films has been studied. We used the fit with Third-Derivative Functional Form model to evaluate the physical parameters. The temperature dependence of band gap and spin-orbit energies can be described by the Bose-Einstein statistical expression. The PR spectra of the samples are measured after thermal annealing in order to check any improvement in the optical quality of the material. The PR signal amplitude of GaAs:V samples decreased after thermal annealing. Degradation of the PR signal for annealing temperature at about 850 °C is observed revealing a poor quality of the layer surface states and an important density of the recombination centers. The lock-in phase analysis of PR spectra allows to determine the time constant for GaAs:V sample before and after thermal annealing.

  8. Comparison of OARE Accelerometer Data with Dopant Distribution in Se-Doped GaAs Crystals Grown During USML-1

    NASA Technical Reports Server (NTRS)

    Moskowitz, Milton E.; Bly, Jennifer M.; Matthiesen, David H.

    1997-01-01

    Experiments were conducted in the crystal growth furnace (CGF) during the first United States Microgravity Laboratory (USML-1), the STS-50 flight of the Space Shuttle Columbia, to determine the segregation behavior of selenium in bulk GaAs in a microgravity environment. After the flight, the selenium-doped GaAs crystals were sectioned, polished, and analyzed to determine the free carrier concentration as a function of position, One of the two crystals initially exhibited an axial concentration profile indicative of diffusion controlled growth, but this profile then changed to that predicted for a complete mixing type growth. An analytical model, proposed by Naumann [R.J. Naumann, J. Crystal Growth 142 (1994) 253], was utilized to predict the maximum allowable microgravity disturbances transverse to the growth direction during the two different translation rates used for each of the experiments. The predicted allowable acceleration levels were 4.86 microgram for the 2.5 micrometers/s furnace translation rate and 38.9 microgram for the 5.0 micrometers/s rate. These predicted values were compared to the Orbital Acceleration Research Experiment (OARE) accelerometer data recorded during the crystal growth periods for these experiments. Based on the analysis of the OARE acceleration data and utilizing the predictions from the analytical model, it is concluded that the change in segregation behavior was not caused by any acceleration events in the microgravity environment.

  9. First-principles electronic structure of Mn-doped GaAs, GaP, and GaN semiconductors

    NASA Astrophysics Data System (ADS)

    Schulthess, T. C.; Temmerman, W. M.; Szotek, Z.; Svane, A.; Petit, L.

    2007-04-01

    We present first-principles electronic structure calculations of Mn-doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin-density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for the magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn d levels in GaAs. We find good agreement between computed values and estimates from photoemission experiments.

  10. First Principles Electronic Structure of Mn doped GaAs, GaP, and GaN Semiconductors

    SciTech Connect

    Schulthess, Thomas C; Temmerman, Walter M; Szotek, Zdzislawa; Svane, Axel; Petit, Leon

    2007-01-01

    We present first-principles electronic structure calculations of Mn doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn-d levels in GaAs. We find good agreement between computed values and estimates from photoemisison experiments.

  11. High-field electroluminescence in semiconductor tunnel junctions with a Mn-doped GaAs layer

    SciTech Connect

    Hai, Pham Nam; Yatsui, Takashi; Ohtsu, Motoichi; Tanaka, Masaaki

    2014-09-21

    We investigated high-field electroluminescence (EL) in semiconductor tunnel junctions with a Mn-doped GaAs layer (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show visible light emissions with two peaks at 1.94 eV and 2.19 eV, which are caused by d-d transitions of the Mn atoms excited by hot electrons. The threshold voltages for band-gap and visible light EL in the tunnel junctions with a GaAs:Mn electrode are 1.3 V higher than those of GaAs:Mn excited by hot holes in reserve biased p⁺-n junctions, which is consistent with the hot carrier transport in the band profiles of these structures. Our EL results at room temperature show that the electron temperature in GaAs:Mn can be as high as ~700 K for a low input electrical power density of 0.4 W/cm², while the lattice temperature of the GaAs:Mn layer can be kept at 340 K.

  12. Evaluation of modulating field of photoreflectance of surface-intrinsic-n+ type doped GaAs by using photoinduced voltage

    NASA Astrophysics Data System (ADS)

    Lee, W. Y.; Chien, J. Y.; Wang, D. P.; Huang, K. F.; Huang, T. C.

    2002-04-01

    Photoreflectance (PR) of surface-intrinsic-n+ type doped GaAs has been measured for various power densities of pump laser. The spectra exhibited many Franz-Keldysh oscillations, whereby the strength of electric field F in the undoped layer can be determined. The thus obtained Fs are subject to photovoltaic effect and are less than built-in field Fbi. In the previous work we have obtained the relation F≈Fbi-δF/2 when δF≪Fbi by using electroreflectance to simulate PR, where δF is the modulating field of the pump beam. In this work a method was devised to evaluate δF by using photoinduced voltages Vs and, hence, the relation can be verified by PR itself. The δFs obtained by Vs are also consistent with those of using imaginary part of fast Fourier transform of PR spectra.

  13. Critical metal-insulator transition due to nuclear quantum effects in Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Bae, Soungmin; Raebiger, Hannes

    2016-12-01

    Mn-doped GaAs exhibits a critical metal-insulator transition at the Mn concentration of xcrit≈1 % . Our self-interaction corrected first principles calculation shows that for Mn concentrations x ≳1 % , hole carriers are delocalized in host valence states, and for x ≲1 % , holes tend to be trapped in impurity-band-like states. We further show that for a finite range of concentrations around xcrit the system exhibits a nonadiabatic superposition of these states, i.e., a mixing of electronic and nuclear wave functions. This means that the phase transition is continuous, and its criticality is caused by quantum effects of the atomic nuclei. In other words, the apparently electronic phase transition from the insulator to metal state cannot be described by electronic effects alone.

  14. Projected noise in submillimeter-wave mixers with InSb Schottky diodes

    NASA Technical Reports Server (NTRS)

    Lieneweg, U.

    1980-01-01

    The reduction of the equivalent noise temperature in liquid-nitrogen-cooled submillimeter-wave mixers by the use of Schottky barriers on InSb instead of GaAs is evaluated by an analytical model that assumes limited local oscillator power and matched impedances. The calculations, executed at 1.0 and 1.8 THz, take plasma resonance and skin effect into account. For single and multiple contacts on homogeneous semiconductor materials of optimum doping, the noise of InSb diodes is smaller than that of GaAs diodes by a factor of 3 to 14. A simplified model is used to predict the performance of epitaxial structures as well as alternative materials.

  15. Passivation of carbon acceptors during growth of carbon-doped GaAs, InGaAs, and HBTs by MOCVD

    SciTech Connect

    Stockman, S.A.; Hanson, A.W.; Lichtenthal, S.M.; Fresina, M.T.; Hoefler, G.E.; Hsieh, K.C.; Stillman, G.E. )

    1992-12-01

    Carbon doped p-type GaAs and In[sub 0.53]Ga[sub 0.47]As epitaxial layers were grown by low-pressure metalorganic chemical vapor deposition using CCl[sub 4] as the carbon source. Low-temperature post-growth annealing resulted in a significant increase in the hole concentration for both GaAs and In[sub 0.53]Ga[sub 0.47]As, especially at high doping levels. The most heavily doped GaAs sample had a hole concentration of 3.6 [times] 10[sup 20] cm[sup [minus]3] after a 5 minute anneal at approximately 400[degree]C in N[sub 2], while the hole concentration in In[sub 0.53]Ga[sub 0.47]As reached 1.6 [times] 10[sup 19] cm[sup [minus]3] after annealing. This behavior is attributed to hydrogen passivation of carbon acceptors. Post-growth cool-down in an AsH[sub 3]/H[sub 2] ambient was found to be the most important factor affecting the degree of passivation for single, uncapped GaAs layers. No evidence of passivation is observed in the base region of InGaP/GaAs HBTs grown at approximately 625[degree]C. The effect of n-type cap layers and cool-down sequence on passivation of C-doped InGaAs grown at approximately 525[degree] shows that hydrogen can come from AsH[sub 3], PH[sub 3], or H[sub 2], and can be incorporated during growth and post-growth cool-down. In the case of InP/InGaAs HBTs, significant passivation was found to occur in the C-doped base region. 28 refs., 5 figs., 2 tabs.

  16. Ultraviolet band-pass Schottky barrier photodetectors formed by Al-doped ZnO contacts to n-GaN

    SciTech Connect

    Sheu, J.K.; Lee, M.L.; Tun, C.J.; Lin, S.W.

    2006-01-23

    This work prepared Al-doped ZnO(AZO) films using dc sputtering to form Schottky contacts onto GaN films with low-temperature-grown GaN cap layer. Application of ultraviolet photodetector showed that spectral responsivity exhibits a narrow bandpass characteristic ranging from 345 to 375 nm. Moreover, unbiased peak responsivity was estimated to be around 0.12 A/W at 365 nm, which corresponds to a quantum efficiency of around 40%. In our study, relatively low responsivity can be explained by the marked absorption of the AZO contact layer. When the reverse biases were below 5 V, the study revealed that dark currents were well below 5x10{sup -12} A even though the samples were annealed at increased temperatures.

  17. Improved broadband antireflection in Schottky-like junction of conformal Al-doped ZnO layer on chemically textured Si surfaces

    NASA Astrophysics Data System (ADS)

    Saini, C. P.; Barman, A.; Kumar, M.; Sahoo, P. K.; Som, T.; Kanjilal, A.

    2014-09-01

    Chemically textured Si with improved absorption in the complete range of solar spectrum is investigated by ultraviolet/visible/near-infrared (UV/Vis/NIR) spectroscopy, showing an average specular reflectance of ˜0.4% in the wavelength of 500-3000 nm. The pyramidal structures on such solar-blind Si can reduce the reflectance further below 0.1% in the UV region by conformal growth of granular Al-doped ZnO (AZO) films. X-ray diffraction analyses suggest the growth of polycrystalline AZO on faceted-Si. Moreover, marginal increase in electrical conductivity of AZO is found on textured surfaces, whereas rise in leakage current in Schottky-like Ag/AZO/Si/Ag heterostructure devices is noticed with increasing Si surface area.

  18. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    García-Cervantes, H.; Rodríguez-Vargas, I.

    2014-05-01

    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n2DA and n2DB, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp3s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  19. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    SciTech Connect

    García-Cervantes, H.; Rodríguez-Vargas, I.

    2014-05-15

    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n{sub 2DA} and n{sub 2DB}, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp{sub 3}s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  20. Structural and magnetic characteristics of MnAs nanoclusters embedded in Be-doped GaAs

    NASA Astrophysics Data System (ADS)

    Rench, D. W.; Schiffer, P.; Samarth, N.

    2011-09-01

    We describe a systematic study of the synthesis, microstructure, and magnetization of hybrid ferromagnet-semiconductor nanomaterials comprised of MnAs nanoclusters embedded in a p-doped GaAs matrix. These samples are created during the in situ annealing of Be-doped (Ga,Mn)As heterostructures grown by molecular beam epitaxy. Transmission electron microscopy and magnetometry studies reveal two distinct classes of nanoclustered samples whose structural and magnetic properties depend on the Mn content of the initial (Ga,Mn)As layer. For Mn content in the range 5-7.5%, annealing creates a superparamagnetic material with a uniform distribution of small clusters (diameter ˜6 nm) and with a low blocking temperature (TB˜10 K). While transmission electron microscopy cannot definitively identify the composition and crystalline phase of these small clusters, our experimental data suggest that they may be comprised of either zinc-blende MnAs or Mn-rich regions of (Ga,Mn)As. At higher Mn content (≳8%), we find that annealing results in an inhomogeneous distribution of both small clusters as well as much larger NiAs-phase MnAs clusters (diameter ˜25 nm). These samples also exhibit supermagnetism, albeit with substantially larger magnetic moments and coercive fields, and blocking temperatures well above room temperature.

  1. The influence of Sb doping on the growth and electronic properties of GaAs(100) and AlGaAs(100)

    NASA Technical Reports Server (NTRS)

    Jamison, K. D.; Chen, H. C.; Bensaoula, A.; Lim, W.; Trombetta, L.

    1989-01-01

    Isoelectronic doping using antimony has been shown to reduce traps and improve material properties during epitaxial growth of Si doped GaAs(100) and AlGaAs(100). In this study, the effect of the antimony dopant on the optimal growth temperature is examined with the aim of producing high-quality heterostructures at lower temperatues. High-quality films of GaAs and AlGaAs have been grown by molecular-beam epitaxy at the normal growth temperatures of 610 and 700 C, respectively, and 50-100 C below this temperature using varying small amounts of Sb as a dopant. Electrical properties of the films were then examined using Hall mobility measurements and deep-level transient spectroscopy.

  2. The influence of Sb doping on the growth and electronic properties of GaAs(100) and AlGaAs(100)

    NASA Technical Reports Server (NTRS)

    Jamison, K. D.; Chen, H. C.; Bensaoula, A.; Lim, W.; Trombetta, L.

    1989-01-01

    Isoelectronic doping using antimony has been shown to reduce traps and improve material properties during epitaxial growth of Si doped GaAs(100) and AlGaAs(100). In this study, the effect of the antimony dopant on the optimal growth temperature is examined with the aim of producing high-quality heterostructures at lower temperatues. High-quality films of GaAs and AlGaAs have been grown by molecular-beam epitaxy at the normal growth temperatures of 610 and 700 C, respectively, and 50-100 C below this temperature using varying small amounts of Sb as a dopant. Electrical properties of the films were then examined using Hall mobility measurements and deep-level transient spectroscopy.

  3. Thermally stimulated current spectroscopy on silicon planar-doped GaAs samples

    NASA Astrophysics Data System (ADS)

    Rubinger, R. M.; Bezerra, J. C.; Chagas, E. F.; González, J. C.; Rodrigues, W. N.; Ribeiro, G. M.; Moreira, M. V. B.; de Oliveira, A. G.

    1998-10-01

    Using thermally stimulated current (TSC) spectroscopy we have identified the presence of several deep traps in low temperature grown (LTG) nonintentionally doped bulk molecular beam epitaxy (MBE)-GaAs and silicon planar-doped MBE-GaAs samples. The experiments of TSC spectroscopy were carried out on a LTG MBE-GaAs epilayer grown at 300 °C and the planar-doped layer with a nominal silicon concentration of 3.4×1012cm-2. The LTG nonintentionally doped bulk MBE-GaAs sample shows three peaks in the TSC spectra but the planar-doped MBE-GaAs sample shows spectra similar to those of bulk samples grown by the liquid-encapsulated Czochralski and vertical gradient freeze methods. The main achievement is the experimental evidence that the potential well present in the planar-doped sample is effective in detecting the presence of different deep traps previously not seen in LTG bulk MBE-GaAs epilayers due to a shorter carrier lifetime (about 10-12 s) in the conduction band which occurs due to EL2-like deep traps recombination. This fact is evidenced by a strong hopping conduction in LTG bulk MBE-GaAs samples at temperatures lower than 300 K, but not in planar-doped MBE-GaAs samples because the two-dimensional electron gas has a higher mobility than lateral LTG bulk MBE-GaAs epilayers.

  4. Low defect densities in molecular beam epitaxial GaAs achieved by isoelectronic In doping

    NASA Technical Reports Server (NTRS)

    Bhattacharya, P. K.; Dhar, S.; Berger, P.; Juang, F.-Y.

    1986-01-01

    A study has been made of the effects of adding small amounts of In (0.2-1.2 pct) to GaAs grown by molecular beam epitaxy. The density of four electron traps decreases in concentration by an order of magnitude, and the peak intensities of prominent emissions in the excitonic spectra are reduced with increase in In content. Based on the higher surface migration rate of In, compared to Ga, at the growth temperatures it is apparent that the traps and the excitonic transitions are related to point defects. This agrees with earlier observations by Briones and Collins (1982) and Skromme et al. (1985).

  5. Low defect densities in molecular beam epitaxial GaAs achieved by isoelectronic In doping

    NASA Technical Reports Server (NTRS)

    Bhattacharya, P. K.; Dhar, S.; Berger, P.; Juang, F.-Y.

    1986-01-01

    A study has been made of the effects of adding small amounts of In (0.2-1.2 pct) to GaAs grown by molecular beam epitaxy. The density of four electron traps decreases in concentration by an order of magnitude, and the peak intensities of prominent emissions in the excitonic spectra are reduced with increase in In content. Based on the higher surface migration rate of In, compared to Ga, at the growth temperatures it is apparent that the traps and the excitonic transitions are related to point defects. This agrees with earlier observations by Briones and Collins (1982) and Skromme et al. (1985).

  6. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron-hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1×1018 to 1×1020cm-3. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of ˜1.5×108cm/s attain a cooler distribution with a mean velocity of ˜4×107 cm/s within about 1 ps for p doping in excess of 1×1019 cm-3. The temporal evolution of average velocity of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs.

  7. Germanium- and tellurium-doped GaAs for non-alloyed {ital p}-type and {ital n}-type ohmic contacts

    SciTech Connect

    Park, J.; Barnes, P.A.; Lovejoy, M.L.

    1995-08-14

    Epitaxial ohmic contacts to GaAs were grown by liquid phase epitaxy. Heavily Ge-doped GaAs was grown to prepare ohmic contacts to {ital p}-GaAs while Te was used for the {ital n}-type contacts. Hall measurements were carried out for the samples grown from melts in which the mole fraction of Ge was varied between 1.55 atomic % and 52.2 atomic %, while the Te mole fractions varied between 0.03% and 0.5%. Specific contact resistance, {ital r}{sub {ital c}}, as low as {ital r}{sub {ital cp}}=2.9{times}10{sup {minus}6} ohm-cm{sup 2} for Ge doping of {ital p}=({ital N}{sub {ital a}}{minus}{ital N}{sub {ital d}})=6.0{times}10{sup 19} holes/cm{sup 3} was measured for {ital p}-contacts and {ital r}{sub {ital cn}}=9.6{times}10{sup {minus}5} ohm-cm{sup 2 }was measured for Te doping of {ital n}=({ital N}{sub {ital d}}{minus}{ital N}{sub {ital a}})=8.9{times}10{sup 18} electrons/cm{sup 3 }for GaAs metallized with non-alloyed contacts of Ti/Al. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  8. Germanium- and tellurium-doped GaAs for non-alloyed p-type and n-type ohmic contacts

    NASA Astrophysics Data System (ADS)

    Park, Joongseo; Barnes, Peter A.; Lovejoy, Michael L.

    1995-08-01

    Epitaxial ohmic contacts to GaAs were grown by liquid phase epitaxy. Heavily Ge-doped GaAs was grown to prepare ohmic contacts to p-GaAs while Te was used for the n-type contacts. Hall measurements were carried out for the samples grown from melts in which the mole fraction of Ge was varied between 1.55 atomic % and 52.2 atomic %, while the Te mole fractions varied between 0.03% and 0.5%. Specific contact resistance, rc, as low as rcp=2.9×10-6 ohm-cm 2 for Ge doping of p=(Na-Nd)=6.0×1019 holes/cm3 was measured for p-contacts and rcn=9.6×10-5 ohm-cm2 was measured for Te doping of n=(Nd-Na)=8.9×1018 electrons/cm3 for GaAs metallized with non-alloyed contacts of Ti/Al.

  9. Analysis of Hyperabrupt and Uniform Junctions in GaAs for the Application of Varactor Diode.

    PubMed

    Heo, Jun-Woo; Hong, Sejun; Choi, Seok-Gyu; Kim, Hyun-Seok

    2015-10-01

    In this study, we present a GaAs varactor diode with a hyperabrupt junction for the enhancement of breakdown voltage and capacitance variation in a reverse bias state. The hyperabrupt doping profile in the n-type active layer is prepared in a controlled nonlinear manner, with the density of the dopants increasing towards the Schottky junction. The hyperabrupt GaAs varactor diode is fabricated and characterized for breakdown voltage and capacitance over the electric field, induced by an applied reverse bias voltage. A reduced value of the electric field is observed owing to the nonlinear behavior of the electric field at the hyperabrupt junction, although the device has a larger doping density at the Schottky junction. Furthermore, the capacitance ratio of the hyperabrupt junction diode is also improved. Variation in the device capacitance is affected by variation in the depletion region across the junction. Technology CAD is used to understand the experimental phenomena by considering the magnitude of charge density as a function of the doping profile. A higher breakdown voltage and greater capacitance modulation are shown in the hyperabrupt junction diode compared to the uniform junction diode.

  10. Effect of the V{sub As}V{sub Ga} complex defect doping on properties of the semi-insulating GaAs

    SciTech Connect

    Ma, Deming Qiao, Hongbo; Shi, Wei; Li, Enling

    2014-04-21

    The different position V{sub As}V{sub Ga} cluster defect doping in semi-insulating (SI) GaAs has been studied by first-principles calculation based on hybrid density functional theory. Our calculated results show that EL6 level is formed due to the V{sub As}V{sub Ga} complex defect, which is very close to the experimental result. It provides the explanation of the absorption of laser with the wavelength beyond in semi-insulating GaAs. The formation energy of V{sub As}V{sub Ga} complex defect is found to decrease from surface to interior gradually. The conduction band minima and valence band maxima of GaAs (001) surface with the V{sub As}V{sub Ga} complex defect are all located at Γ point, and some defect levels are produced in the forbidden band. In contrast, the conduction band minima and valence band maxima of GaAs with the interior V{sub As}V{sub Ga} complex defect are not located at the same k-point, so it might involve the change of momentum in the electron transition process. The research will help strengthen the understanding of photoelectronic properties and effectively guide the preparation of the SI-GaAs materials.

  11. Ga self-diffusion in isotopically enriched GaAs heterostructures doped with Si and Zn

    SciTech Connect

    Norseng, Marshall Stephen

    1999-12-01

    This study attempts to advance the modeling of AlGaAs/GaAs/AlAs diffusion by experimental investigation of Ga self-diffusion in undoped, as-grown doped and Zinc diffused structures. We utilize novel, isotopically enriched superlattice and heterostructure samples to provide direct observation and accurate measurement of diffusion with a precision not possible using conventional techniques.

  12. Intermediate Band Performance of GaSb Type-II Quantum Dots Located in n-Doped Region of GaAs Solar Cells

    NASA Astrophysics Data System (ADS)

    Kechiantz, Ara; Afanasev, Andrei

    2013-03-01

    The intermediate band (IB) electronic states assist sub-bandgap photons in generation of additional photocurrent in single-junction solar cells. Such non-linear effect of resonant two-photon absorption of concentrated sunlight attracts much attention because it promises up to 63% conversion efficiency in IB solar cells. The main obstacle to achieving high performance is involvement of IB-states in electron-hole recombination that is drastically increasing the dark current and reducing the open circuit voltage of IB solar cells. The IB-states can be composed of quantum dots (QDs). Concentration of sunlight limits recombination through type-II QD IB-states located outside of the depletion region. In this work we model GaAs solar cell with strained GaSb type-II QDs separated from the depletion region. The focus is on type-II QDs located in n-doped region of p-n-junction. Our calculation shows that photovoltaic performance can be essentially improved by concentration of sunlight, and that this improvement is highly sensitive to the doping of materials and the shape of potential barriers surrounding type-II QDs. For instance, strained GaSb type-II QDs may increase the performance of GaAs solar cell by 20% compared to the reference GaAs solar cell without QDs.

  13. Heat load of a P-doped GaAs photocathode in SRF electron gun

    SciTech Connect

    Wang, E.; Ben-Zvi, I.; Kewisch, J.; Burrill, A.; Rao, T.; Wu, Q.; Jain, A.; Gupta, R.; Holmes, D.

    2010-05-23

    Many efforts were made over the last decades to develop a better polarized electron source for the high energy physics. Several laboratories operate DC guns with the Gallium-Arsenide photo-cathode, which yield a highly polarized electron beam. However, the beam's emittance might well be improved using a Superconducting RF electron gun, which delivers beams of higher brightness than DC guns does, because the field gradient at the cathode is higher. SRF guns with metal cathodes and CsTe cathodes have been tested successfully. To produce polarized electrons, a Gallium-Arsenide photo-cathode must be used: an experiment to do so in a superconducting RF gun is under way at BNL. Since the cathode will be normal conducting, the problem about the heat load stemming from the cathode arises. We present our measurements of the electrical resistance of GaAs at cryogenic temperatures, a prediction of the heat load and the verification by measuring the quality factor of the gun with and without cathode.

  14. GaAs Self-Aligned JFETS with Carbon-Doped P+ Region

    SciTech Connect

    Allerman, A.A.; Baca, A.G.; Chang, P.C.; Drummond, T.J.

    1999-02-15

    Self-aligned JFETs with a carbon-doped p{sup +} region have been reported for the first time. For these JFETs, both the channel and p{sup +} region were grown by metal organic chemical vapor deposition (MOCVD) and are termed epitaxial JFETs in this study. The epitaxial JFETs were compared to ion implanted JFETs of similar channel doping and threshold voltage. Both JFETs were fabricated using the same self-aligned process for doping the source and drain regions of the JFET and for eliminating excess gate capacitance of conventional JFETs. The gate turn-on voltage for the epitaxial JFETs was 1.06 V, about 0.1 V higher than for the implanted JFETs. The reverse breakdown voltage was similar for both JFETs but the reverse gate leakage current of the epitaxial JFETs was 1-3 orders of magnitude less than the implanted JFETs. The epitaxial JFETs also showed higher transconductance and lower knee voltage than the implanted JFETs.

  15. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    SciTech Connect

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron{endash}hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1{times}10{sup 18} to 1{times}10{sup 20}cm{sup {minus}3}. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of {similar_to}1.5{times}10{sup 8}cm/s attain a cooler distribution with a mean velocity of {similar_to}4{times}10{sup 7}cm/s within about 1 ps for p doping in excess of 1{times}10{sup 19}cm{sup {minus}3}. The temporal evolution of average velocity {l_angle}v{r_angle} of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs. {copyright} 2001 American Institute of Physics.

  16. The effect of sputter cleaning on Au/GaAs contacts and the role of doping

    NASA Astrophysics Data System (ADS)

    Yeh, Liu Lu-Min; Xie, Yu-Jun; Holloway, Paul H.

    1989-05-01

    The effects of Ar-ion sputtering on electrical properties of Au contacts on (100) GaAs and the role of doping concentration have been studied. The n-GaAs was doped with 1017 or 1018 cm-3 Si or with 1018 cm-3 Te and the p-GaAs with 1018 or 1019 cm-3 Zn. After either chemical etching or Ar-ion beam cleaning of the GaAs, Au contacts were formed by evaporation in ultrahigh vacuum (10-9 Torr). Ion bombardment with Ar+ produced clean but nonstoichiometric, damaged GaAs surfaces. Contacts on chemically cleaned GaAs were either (nearly) ohmic or Schottky, depending upon the dopant and concentration. On sputtered GaAs, all the contacts showed soft rectification but did not act as purely Schottky contacts. The type of dopants, i.e., n or p, caused differences in the I-V behavior, but the behavior for different dopants of the same type was very similar. Sputtering increased the depletion depth on all the samples, and the depletion depth became larger as the ion energy increased and/or the dopant concentration decreased. The electrical behavior of the sputtered samples is suggested to result from the creation of a compensated layer with deep defect states. The deep level states are postulated to be related to defects resulting from sputtering.

  17. Cooperative transition of electronic states of antisite As defects in Be-doped low-temperature-grown GaAs layers

    NASA Astrophysics Data System (ADS)

    Ambri Mohamed, Mohd; Tien Lam, Pham; Bae, K. W.; Otsuka, N.

    2011-12-01

    Magnetic properties resulting from localized spins associated with antisite arsenic ions AsGa+ in Be-doped low-temperature-grown GaAs (LT-GaAs) layers were studied by measuring the magnetization of lift-off samples. With fast cooling, the magnetization of samples at 1.8 K becomes significantly lower than that expected from Curie-type paramagnetism in the range of the applied field to 7 T, and a transition from low magnetization to the magnetization of paramagnetism occurs upon the heating of samples to 4.5 K. With slow cooling, on the other hand, samples have a paramagnetic temperature dependence throughout the measurement-temperature range. The magnetization was found to decrease monotonically when a sample was kept at a fixed low temperature. These observations are explained by the cooperative transition of electron states of AsGa defects, which is closely related to the normal-metastable state transition of EL2 defects in semi-insulating GaAs. The results of the magnetization measurements in the present study suggest that AsGa+ ions are spontaneously displaced at low temperature without photoexcitation in Be-doped LT-GaAs. The similarity of the transition observed in this system to the normal-metastable state transition of the EL2 defect was also suggested by first-principle calculations of the electron state of an AsGa defect with a doped Be atom.

  18. Growth studies of erbium-doped GaAs deposited by metalorganic vapor phase epitaxy using noval cyclopentadienyl-based erbium sources

    NASA Technical Reports Server (NTRS)

    Redwing, J. M.; Kuech, T. F.; Gordon, D. C.; Vaartstra, B. A.; Lau, S. S.

    1994-01-01

    Erbium-doped GaAS layers were grown by metalorganic vapor phase epitaxy using two new sources, bis(i-propylcyclopentadienyl)cyclopentadienyl erbium and tris(t-butylcyclopentadienyl) erbium. Controlled Er doping in the range of 10(exp 17) - 10(exp 18)/cu cm was achieved using a relatively low source temperature of 90 C. The doping exhibits a second-order dependence on inlet source partial pressure, similar to behavior obtained with cyclopentadienyl Mg dopant sources. Equivalent amounts of oxygen and Er are present in 'as-grown' films indicating that the majority of Er dopants probably exist as Er-O complexes in the material. Er(+3) luminescence at 1.54 micrometers was measured from the as-grown films, but ion implantation of additional oxygen decreases the emission intensity. Electrical compensation of n-type GaAs layers codoped with Er and Si is directly correlated to the Er concentration is proposed to arise from the deep centers associated with Er which are responsible for a broad emission band near 0.90 micrometers present in the photoluminescence spectra of GaAs:Si, Er films.

  19. Growth studies of erbium-doped GaAs deposited by metalorganic vapor phase epitaxy using noval cyclopentadienyl-based erbium sources

    NASA Technical Reports Server (NTRS)

    Redwing, J. M.; Kuech, T. F.; Gordon, D. C.; Vaartstra, B. A.; Lau, S. S.

    1994-01-01

    Erbium-doped GaAS layers were grown by metalorganic vapor phase epitaxy using two new sources, bis(i-propylcyclopentadienyl)cyclopentadienyl erbium and tris(t-butylcyclopentadienyl) erbium. Controlled Er doping in the range of 10(exp 17) - 10(exp 18)/cu cm was achieved using a relatively low source temperature of 90 C. The doping exhibits a second-order dependence on inlet source partial pressure, similar to behavior obtained with cyclopentadienyl Mg dopant sources. Equivalent amounts of oxygen and Er are present in 'as-grown' films indicating that the majority of Er dopants probably exist as Er-O complexes in the material. Er(+3) luminescence at 1.54 micrometers was measured from the as-grown films, but ion implantation of additional oxygen decreases the emission intensity. Electrical compensation of n-type GaAs layers codoped with Er and Si is directly correlated to the Er concentration is proposed to arise from the deep centers associated with Er which are responsible for a broad emission band near 0.90 micrometers present in the photoluminescence spectra of GaAs:Si, Er films.

  20. Light Intensity Influence on the Effective Schottky Barrier Height in Extraordinary Optoconductance (EOC) Structures

    NASA Astrophysics Data System (ADS)

    Werner, F. M.; Tran, L. C.; Solin, S. A.

    2013-03-01

    Novel micro to nanoscale metal-semiconductor-hybrid (MSH) structures capable of room temperature light detection have been previously reported and classified as Extraordinary Optoconductance (EOC) devices. The devices are square stacked structures, with a Au-Ti shunt forming a Schottky-Interface with an n-doped Ga-As mesa. Resistance measurements were taken by a 4-point van-der Pauw method to remove contact and lead resistance and eliminate DC offsets. The device's resistance changes as light incident on the surface of the structure modifies the charge density within the body of the device. The change in charge density changes the effective Schottky Barrier height and shifts the measured 4 point resistance of the heterogeneous structure. We investigate the dependence of the effective Schottky Barrier height on the incident intensity of light by measuring the open circuit voltage under various intensities of optical perturbation at room temperature. The barrier height is negligible and the interface ohmic under HeNe laser 632.8 nm illumination at a power density of 636 mW/cm2, allowing the flow of current through the shunt. This device performance will be contrasted with that of an FET, where current does not propagate through the gate. SAS has a financial interest in PixelEXX, a start-up company whose mission is to market imaging arrays.

  1. Investigation of the optical properties of GaAs with δ-Si doping grown by molecular-beam epitaxy at low temperatures

    SciTech Connect

    Lavrukhin, D. V. Yachmenev, A. E.; Bugaev, A. S.; Galiev, G. B.; Klimov, E. A.; Khabibullin, R. A.; Ponomarev, D. S.; Maltsev, P. P.

    2015-07-15

    Molecular-beam epitaxy is used for the preparation of structures based on “low-temperature” grown GaAs with introduced d-Si doping. Specific features in the photon-energy range of 1.28–1.48 eV are observed in the photoluminescence spectrum after structures annealing at temperatures of 520 and 580°C; these features are related to the formation of point defects and their complexes. The “pump–probe” light transmission measurements reveal that the characteristic lifetimes of nonequilibrium carriers in the fabricated structures amount to T{sup c} ≈ 1.2–1.5 ps.

  2. Magnesium doping of efficient GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Ford, C. W.; Werthen, J. G.

    1984-01-01

    Magnesium has been substituted for zinc in GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)magnesium (Cp2Mg) is used as the MOCVD transport agent for Mg. Full retention of excellent material quality and efficient cell performance results. The substitution of Mg for Zn would enhance the abruptness and reproducibility of doping profiles, and facilitate high temperature processing and operation, due to the much lower diffusion coefficient of Mg, relative to Zn, in these materials.

  3. Magnesium doping of efficient GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Ford, C. W.; Werthen, J. G.

    1984-01-01

    Magnesium has been substituted for zinc in GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)magnesium (Cp2Mg) is used as the MOCVD transport agent for Mg. Full retention of excellent material quality and efficient cell performance results. The substitution of Mg for Zn would enhance the abruptness and reproducibility of doping profiles, and facilitate high temperature processing and operation, due to the much lower diffusion coefficient of Mg, relative to Zn, in these materials.

  4. Planar Schottky technology for submillimeter wavelengths

    NASA Technical Reports Server (NTRS)

    Crowe, Thomas W.; Bishop, William L.; Hesler, Jeffrey L.; Marazita, Steven M.; Koh, Philip J.; Porterfield, David W.

    1996-01-01

    Work carried out in relation to the development of planar integrated Schottky diodes with the aim of increasing the sensitivity, reliability and efficiency of spaceborne heterodyne receivers, is reported. The results of this work include a planar diode mixer at 585 GHz with a total receiver noise temperature of 2,380 K double side band, and planar diode multipliers. The prospects for further integration of circuit elements with the GaAs diodes are discussed.

  5. Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3 gate stack: study of Ge auto-doping and p-type Zn doping

    PubMed Central

    2012-01-01

    Electrical and physical properties of a metal-oxide-semiconductor [MOS] structure using atomic layer-deposited high-k dielectrics (TiO2/Al2O3) and epitaxial GaAs [epi-GaAs] grown on Ge(100) substrates have been investigated. The epi-GaAs, either undoped or Zn-doped, was grown using metal-organic chemical vapor deposition method at 620°C to 650°C. The diffusion of Ge atoms into epi-GaAs resulted in auto-doping, and therefore, an n-MOS behavior was observed for undoped and Zn-doped epi-GaAs with the doping concentration up to approximately 1017 cm-3. This is attributed to the diffusion of a significant amount of Ge atoms from the Ge substrate as confirmed by the simulation using SILVACO software and also from the secondary ion mass spectrometry analyses. The Zn-doped epi-GaAs with a doping concentration of approximately 1018 cm-3 converts the epi-GaAs layer into p-type since the Zn doping is relatively higher than the out-diffused Ge concentration. The capacitance-voltage characteristics show similar frequency dispersion and leakage current for n-type and p-type epi-GaAs layers with very low hysteresis voltage (approximately 10 mV). PACS: 81.15.Gh. PMID:22297193

  6. Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3 gate stack: study of Ge auto-doping and p-type Zn doping.

    PubMed

    Dalapati, Goutam Kumar; Shun Wong, Terence Kin; Li, Yang; Chia, Ching Kean; Das, Anindita; Mahata, Chandreswar; Gao, Han; Chattopadhyay, Sanatan; Kumar, Manippady Krishna; Seng, Hwee Leng; Maiti, Chinmay Kumar; Chi, Dong Zhi

    2012-02-02

    Electrical and physical properties of a metal-oxide-semiconductor [MOS] structure using atomic layer-deposited high-k dielectrics (TiO2/Al2O3) and epitaxial GaAs [epi-GaAs] grown on Ge(100) substrates have been investigated. The epi-GaAs, either undoped or Zn-doped, was grown using metal-organic chemical vapor deposition method at 620°C to 650°C. The diffusion of Ge atoms into epi-GaAs resulted in auto-doping, and therefore, an n-MOS behavior was observed for undoped and Zn-doped epi-GaAs with the doping concentration up to approximately 1017 cm-3. This is attributed to the diffusion of a significant amount of Ge atoms from the Ge substrate as confirmed by the simulation using SILVACO software and also from the secondary ion mass spectrometry analyses. The Zn-doped epi-GaAs with a doping concentration of approximately 1018 cm-3 converts the epi-GaAs layer into p-type since the Zn doping is relatively higher than the out-diffused Ge concentration. The capacitance-voltage characteristics show similar frequency dispersion and leakage current for n-type and p-type epi-GaAs layers with very low hysteresis voltage (approximately 10 mV).PACS: 81.15.Gh.

  7. Rapid evaluation of doping-spike carrier concentration levels in millimetre-wave GaAs Gunn diodes with hot-electron injection

    NASA Astrophysics Data System (ADS)

    Farrington, N. E. S.; Carr, M. W.; Missous, M.

    2010-12-01

    This paper describes a novel method for fast, accurate evaluation of doping-spike carrier concentrations in hot-electron injected GaAs Gunn diodes. The technique relies on current asymmetry measurements obtained using pulsed-dc testing of on-wafer quasi-planar Gunn diode test structures, which removes the need for full device fabrication. Small changes in carrier concentration can easily be detected (at a nominal value of 1 × 1018 cm-3) and a greater sensitivity than conventional techniques is demonstrated at the doping levels used. In addition, test structure fabrication can be integrated into the initial Gunn diode front side production process allowing a rapid in-process test to be carried out thus leading to a significant reduction in material characterization cycle time.

  8. Nonlinear optical properties of asymmetric n-type double δ-doped GaAs quantum well under intense laser field

    NASA Astrophysics Data System (ADS)

    Sari, Huseyin; Kasapoglu, Esin; Yesilgul, Unal; Sakiroglu, Serpil; Ungan, Fatih; Sökmen, Ismail

    2017-09-01

    The effect of non-resonant intense laser field on the intersubband-related optical absorption coefficient and refractive index change in the asymmetric n-type double δ-doped GaAs quantum well is theoretically investigated. The confined energy levels and corresponding wave functions of this structure are calculated by solving the Schrödinger equation in the laser-dressed confinement potential within the framework of effective mass approximation. The optical responses are reported as a function of the δ-doped impurities density and the applied non-resonant intense laser field. Additionally, the calculated results also reveal that the non-resonant intense laser field can be used as a way to control the electronic and optical properties of the low dimensional semiconductor nano-structures.

  9. Selective-area growth of heavily n–doped GaAs nanostubs on Si(001) by molecular beam epitaxy

    SciTech Connect

    Chang, Yoon Jung Woo, Jason C. S.; Simmonds, Paul J.

    2016-04-18

    Using an aspect ratio trapping technique, we demonstrate molecular beam epitaxy of GaAs nanostubs on Si(001) substrates. Nanoholes in a SiO{sub 2} mask act as a template for GaAs-on-Si selective-area growth (SAG) of nanostubs 120 nm tall and ≤100 nm in diameter. We investigate the influence of growth parameters including substrate temperature and growth rate on SAG. Optimizing these parameters results in complete selectivity with GaAs growth only on the exposed Si(001). Due to the confined-geometry, strain and defects in the GaAs nanostubs are restricted in lateral dimensions, and surface energy is further minimized. We assess the electrical properties of the selectively grown GaAs nanostubs by fabricating heterogeneous p{sup +}–Si/n{sup +}–GaAs p–n diodes.

  10. Selective-area growth of heavily n-doped GaAs nanostubs on Si(001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Chang, Yoon Jung; Simmonds, Paul J.; Beekley, Brett; Goorsky, Mark S.; Woo, Jason C. S.

    2016-04-01

    Using an aspect ratio trapping technique, we demonstrate molecular beam epitaxy of GaAs nanostubs on Si(001) substrates. Nanoholes in a SiO2 mask act as a template for GaAs-on-Si selective-area growth (SAG) of nanostubs 120 nm tall and ≤100 nm in diameter. We investigate the influence of growth parameters including substrate temperature and growth rate on SAG. Optimizing these parameters results in complete selectivity with GaAs growth only on the exposed Si(001). Due to the confined-geometry, strain and defects in the GaAs nanostubs are restricted in lateral dimensions, and surface energy is further minimized. We assess the electrical properties of the selectively grown GaAs nanostubs by fabricating heterogeneous p+-Si/n+-GaAs p-n diodes.

  11. Low temperature tunneling transport in van der Waals contacted superconductor/semiconductor Schottky barriers

    NASA Astrophysics Data System (ADS)

    Li, Ang; Hebard, Arthur

    We present a comparative study over a large temperature range (2.5-300K) of Schottky barriers formed either by evaporation of normal metals (Au, Al) or by van der Waals contact of mechanically exfoliated under-doped high-Tc Bi-2212 flakes onto moderately doped n-type GaAs and p-type Si semiconductor substrates. Our modified barrier-inhomogeneity model applied to the thermionic emission equation gives a good description of the temperature evolution of barrier parameters, such as the zero-bias Schottky barrier height ΦSB0 (T) , the ideality factor η (T) and the flat band barrier height, as the temperature is lowered from high temperatures where thermionic emission dominates to lower temperatures where thermal field emission and field emission (direct tunneling) dominate. At low temperatures for all barriers studied, both ΦSB0 (T) and η-1 (T) are linear in temperature with zero intercepts. Direct tunneling is verified in the Bi-2212/n-GaAs barriers by the appearance of superconducting density of states curves along with an energy gap 2 Δ = 65 meV in good agreement with ARPES and scanning tunneling microscope results by other investigators. Work supported by NSF DMR #1305783.

  12. Schottky barrier solar cell

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.; Yeh, Y. C. M. (Inventor)

    1981-01-01

    A method of fabricating a Schottky barrier solar cell is described. The cell consists of a thin substrate of low cost material with at least the top surface of the substrate being electrically conductive. A thin layer of heavily doped n-type polycrystalling germanium is deposited on the substrate after a passivation layer is deposited to prevent migration of impurities into the polycrystalline germanium. The polycrystalline germanium is recrystallized to increase the crystal sizes to serve as a base layer on which a thin layer of gallium arsenide is vapor-epitaxilly grown followed by a thermally-grown oxide layer. A metal layer is deposited on the oxide layer and a grid electrode is deposited to be in electrical contact with the top surface of the metal layer.

  13. Theoretical investigation of Schottky-barrier diode noise performance in external resonant circuits

    NASA Astrophysics Data System (ADS)

    Shiktorov, P.; Starikov, E.; Gruzinskis, V.; Pérez, S.; González, T.; Reggiani, L.; Varani, L.; Vaissière, J. C.

    2006-04-01

    We report Monte Carlo simulations of electronic noise in heavily doped nanometric GaAs Schottky-barrier diodes (SBDs) recently proposed as promising devices for THz applications. We consider a SBD operating in series with a parallel output resonant circuit when a high-frequency large-signal voltage is applied to the whole system. Significant modifications of the noise spectrum with respect to the diode subjected to a constant applied voltage are found to occur in the THz-region. To interpret such behaviour, we have developed a simple analytical approach based on the static I-V and C-V relations as well as on the series resistance of the SBD.

  14. The Design and Analysis of Antiparallel Schottky Diode Mixers

    DTIC Science & Technology

    2000-09-29

    part is provided here to allow users access to individually authored sections f proceedings, annals, symposia, etc. However, the component should be...S.M. Marazita , W.L. Bishop, J.L. Hesler, K. Hui, W.E. Bowen, tune the LO impedance while not affecting the RF and T.W. Crowe, "Integrated GaAs Schottky

  15. A new technique to study transient conductivity under pulsed monochromatic light in Cr-doped GaAs using acoustoelectric voltage measurement

    NASA Technical Reports Server (NTRS)

    Tabib-Azar, Massood

    1991-01-01

    The transient conductivity of high-resistivity Bridgman-grown Cr-doped GaAs under pulsed monochromatic light is monitored using transverse acoustoelectric voltage (TAV) at 83 K. Keeping the photon flux constant, the height and transient time constant at the TAV are used to calculate the energy dependence of the trap density and its cross section, respectively. Two prominent trap profiles with peak trap densities of approximately 10 to the 17th/cu cm eV near the valence and the conduction bands are detected. These traps have very small capture cross sections in the range of 10 to the -23 to 10 to the -21st cm sq. A phenomenon similar to the persistent photoconductivity with transient time constants in excess of a few seconds in high-resistivity GaAs at T = 83 K is also detected using this technique. These long relaxation times are readily explained by the spatial separation of the photo-excited electron-hole pairs and the small capture cross section and large density of trap distribution near the conduction band.

  16. 808-nm diode-pumped dual-wavelength passively Q-switched Nd:LuLiF4 laser with Bi-doped GaAs

    NASA Astrophysics Data System (ADS)

    Li, S. X.; Li, T.; Li, D. C.; Zhao, S. Z.; Li, G. Q.; Hang, Y.; Zhang, P. X.; Li, X. Y.; Qiao, H.

    2015-09-01

    Diode-pumped CW and passively Q-switched Nd:LuLiF4 lasers with stable, synchronous dual-wavelength operations near 1047 and 1053 nm were demonstrated for the first time. The maximal CW output power of 821 mW was obtained at an incident pump power of 6.52 W. Employing high quality Bi-doped GaAs as saturable absorber, stable dual-wavelength Q-switched operation was realized. Under 6.52 W incident pump power, the minimal pulse duration of 1.5 ns, the largest single pulse energy of 11.32 μJ, and the highest peak power of 7.25 kW were achieved.

  17. Direct identification of interstitial Mn in heavily p-type doped GaAs and evidence of its high thermal stability

    SciTech Connect

    Pereira, L. M. C.; Wahl, U.; Correia, J. G.; Decoster, S.; Vantomme, A.; Silva, M. R. da; Araujo, J. P.

    2011-05-16

    We report on the lattice location of Mn in heavily p-type doped GaAs by means of {beta}{sup -} emission channeling from the decay of {sup 56}Mn. The majority of the Mn atoms substitute for Ga and up to 31% occupy the tetrahedral interstitial site with As nearest neighbors. Contrary to the general belief, we find that interstitial Mn is immobile up to 400 deg. C, with an activation energy for diffusion of 1.7-2.3 eV. Such high thermal stability of interstitial Mn has significant implications on the strategies and prospects for achieving room temperature ferromagnetism in Ga{sub 1-x}Mn{sub x}As.

  18. Alloy formation during molecular beam epitaxy growth of Si-doped InAs nanowires on GaAs[111]B

    PubMed Central

    Davydok, Anton; Rieger, Torsten; Biermanns, Andreas; Saqib, Muhammad; Grap, Thomas; Lepsa, Mihail Ion; Pietsch, Ullrich

    2013-01-01

    Vertically aligned InAs nanowires (NWs) doped with Si were grown self-assisted by molecular beam epitaxy on GaAs[111]B substrates covered with a thin SiOx layer. Using out-of-plane X-ray diffraction, the influence of Si supply on the growth process and nanostructure formation was studied. It was found that the number of parasitic crystallites grown between the NWs increases with increasing Si flux. In addition, the formation of a Ga0.2In0.8As alloy was observed if the growth was performed on samples covered by a defective oxide layer. This alloy formation is observed within the crystallites and not within the nanowires. The Ga concentration is determined from the lattice mismatch of the crystallites relative to the InAs nanowires. No alloy formation is found for samples with faultless oxide layers. PMID:24046494

  19. Alloy formation during molecular beam epitaxy growth of Si-doped InAs nanowires on GaAs[111]B.

    PubMed

    Davydok, Anton; Rieger, Torsten; Biermanns, Andreas; Saqib, Muhammad; Grap, Thomas; Lepsa, Mihail Ion; Pietsch, Ullrich

    2013-08-01

    Vertically aligned InAs nanowires (NWs) doped with Si were grown self-assisted by molecular beam epitaxy on GaAs[111]B substrates covered with a thin SiO x layer. Using out-of-plane X-ray diffraction, the influence of Si supply on the growth process and nanostructure formation was studied. It was found that the number of parasitic crystallites grown between the NWs increases with increasing Si flux. In addition, the formation of a Ga0.2In0.8As alloy was observed if the growth was performed on samples covered by a defective oxide layer. This alloy formation is observed within the crystallites and not within the nanowires. The Ga concentration is determined from the lattice mismatch of the crystallites relative to the InAs nanowires. No alloy formation is found for samples with faultless oxide layers.

  20. Electrical properties of Mg-doped GaAs and AlxGa1-xAs (x<=0.36)

    NASA Astrophysics Data System (ADS)

    Csontos, L.; Podor, Balint; Somogyi, K.; Andor, L.

    1992-08-01

    Mg-doped GaAs and AlxGa1-xAs (x

  1. Consideration of velocity saturation in the design of GaAs varactor diodes

    NASA Technical Reports Server (NTRS)

    Crowe, Thomas W.; Peatman, William C. B.; Zimmermann, Ruediger; Zimmermann, Ralph

    1993-01-01

    The design of GaAs Schottky barrier varactor diodes is reconsidered in light of the recent discovery of velocity saturation effects in these devices. Experimental data is presented which confirms that improved multiplier performance can be achieved.

  2. IBIC analysis of gallium arsenide Schottky diodes

    NASA Astrophysics Data System (ADS)

    Vittone, E.; Fizzotti, F.; Mirri, K.; Gargioni, E.; Polesello, P.; LoGiudice, A.; Manfredotti, C.; Galassini, S.; Rossi, P.; Vanni, P.; Nava, F.

    1999-10-01

    Semi-insulating (SI) gallium arsenide (GaAs) devices operating as a reverse biased Schottky diode offer an attractive choice as radiation detector at room temperature both in high energy physics experiments and as X-ray image sensors. However, SI GaAs devices contain a high concentration of traps, which decreases the charge collection efficiency (cce), and affects the energy resolution of such detectors working as nuclear spectrometers. In this paper we present a detailed investigation of the spatial uniformity of the cce carried out by analysing ion beam induced charge (IBIC) space maps obtained by scanning a focused 2 MeV proton microbeam on a SI n-GaAs Schottky diode. The microbeam irradiated both the front (Schottky) and back (ohmic) contacts in order to evaluate the transport properties of both electrons and holes generated by ionisation. The IBIC space maps show a clear non-uniformity of the cce. The poor energy resolution previously observed in such detectors working as alpha particle spectrometers is ascribed to the presence of two different "phases" in the material, which produce two distinct collection efficiency spectra. Such "phases" show different behaviour as a function of the applied bias voltage which is most likely due to the different electric field dependence of the relevant capture cross sections of the trapping centres for both charge carriers.

  3. Quantitative analysis of the effects of vertical magnetic fields on microsegregation in Te-doped LEC GaAs

    NASA Technical Reports Server (NTRS)

    Carlson, D. J.; Witt, A. F.

    1992-01-01

    Using near-IR transmission microscopy with computational absorption analysis, the effects of axial magnetic fields on micro- and macrosegregation during LP-LEC growth of GaAs were quantitatively investigated with a spatial resolution approaching 2 microns. Segregation inhomogeneities exceeding one order of magnitude are found to be related to fluid dynamics of the melt. The applicability of the BPS theory as well as the nonapplicability of the Cochran analysis are established.

  4. Fundamental studies of graphene/graphite and graphene-based Schottky photovoltaic devices

    NASA Astrophysics Data System (ADS)

    Miao, Xiaochang

    In the carbon allotropes family, graphene is one of the most versatile members and has been extensively studied since 2004. The goal of this dissertation is not only to investigate the novel fundamental science of graphene and its three-dimensional sibling, graphite, but also to explore graphene's promising potential in modern electronic and optoelectronic devices. The first two chapters provide a concise introduction to the fundamental solid state physics of graphene (as well as graphite) and the physics at the metal/semiconductor interfaces. In the third chapter, we demonstrate the formation of Schottky junctions at the interfaces of graphene (semimetal) and various inorganic semiconductors that play dominating roles in today's semiconductor technology, such as Si, SiC, GaAs and GaN. As shown from their current-voltage (I -V) and capacitance-voltage (C-V) characteristics, the interface physics can be well described within the framework of the Schottky-Mott model. The results are also well consist with that from our previous studies on graphite based Schottky diodes. In the fourth chapter, as an extension of graphene based Schottky work, we investigate the photovoltaic (PV) effect of graphene/Si junctions after chemically doped with an organic polymer (TFSA). The power conversion efficiency of the solar cell improves from 1.9% to 8.6% after TFSA doping, which is the record in all graphene based PVs. The I -V, C-V and external quantum efficiency measurements suggest 12 that such a significant enhancement in the device performance can be attributed to a doping-induced decrease in the series resistance and a simultaneous increase in the built-in potential. In the fifth chapter, we investigate for the first time the effect of uniaxial strains on magneto-transport properties of graphene. We find that low-temperature weak localization effect in monolayer graphene is gradually suppressed under increasing strains, which is due to a strain-induced decreased intervalley

  5. Development of bulk GaAs room temperature radiation detectors

    SciTech Connect

    McGregor, D.S.; Knoll, G.F. . Dept. of Nuclear Engineering); Eisen, Y. . Soreq Nuclear Research Center); Brake, R. )

    1992-10-01

    This paper reports on GaAs, a wide band gap semiconductor with potential use as a room temperature radiation detector. Various configurations of Schottky diode detectors were fabricated with bulk crystals of liquid encapsulated Czochralski (LEC) semi-insulating undoped GaAs material. Basic detector construction utilized one Ti/Au Schottky contact and one Au/Ge/Ni alloyed ohmic contact. Pulsed X-ray analysis indicated pulse decay times dependent on bias voltage. Pulse height analysis disclosed non-uniform electric field distributions across the detectors tentatively explained as a consequence of native deep level donors (EL2) in the crystal.

  6. The Automated DC Parameter Testing of GaAs MESFETs Using the Singer Automatic Integrated Circuit Test System.

    DTIC Science & Technology

    1980-09-01

    Equivalent GaAs MESFET Circuit Model 37 11 Hower’s Equivalent GaAs MESFET Circuit Model 38 12 Modified DC Equivalent Circuit Model of...I Truth Table for the GaAs MESFET Logic Gate of Figure 1 29 II Equivalent - Circuit Parameters of a GaAs MESFET with a 1 micron x 500 micron Gate 39...using Schottky diodes in the output buffer circuit . The number of diodes required is determined by the pinchoff voltage of the

  7. Structural properties of pressure-induced structural phase transition of Si-doped GaAs by angular-dispersive X-ray diffraction

    NASA Astrophysics Data System (ADS)

    Lin, Kung-Liang; Lin, Chih-Ming; Lin, Yu-Sheng; Jian, Sheng-Rui; Liao, Yen-Fa; Chuang, Yu-Chun; Wang, Chuan-Sheng; Juang, Jenh-Yih

    2016-02-01

    Pressure-induced phase transitions in n-type silicon-doped gallium arsenide (GaAs:Si ) at ambient temperature were investigated by using angular-dispersive X-ray diffraction (ADXRD) under high pressure up to around 18.6 (1) GPa, with a 4:1 (in volume ratio) methanol-ethanol mixture as the pressure-transmitting medium. In situ ADXRD measurements revealed that n-type GaAs:Si starts to transform from zinc- blende structure to an orthorhombic structure [GaAs-II phase], space group Pmm2, at 16.4 (1) GPa. In contrast to previous studies of pure GaAs under pressure, our results show no evidence of structural transition to Fmmm or Cmcm phase. The fitting of volume compression data to the third-order Birch-Murnaghan equation of state yielded that the zero-pressure isothermal bulk moduli and the first-pressure derivatives were 75 (3) GPa and 6.4 (9) for the B3 phase, respectively. After decompressing to the ambient pressure, the GaAs:Si appears to revert to the B3 phase completely. By fitting to the empirical relations, the Knoop microhardness numbers are between H PK = 6.21 and H A = 5.85, respectively, which are substantially smaller than the values of 7-7.5 for pure GaAs reported previously. A discontinuous drop in the pressure-dependent lattice parameter, N- N distances, and V/ V 0 was observed at a pressure of 11.5 (1) GPa, which was tentatively attributed to the pressure-induced dislocation activities in the crystal grown by vertical gradient freeze method.

  8. Design, fabrication, and performance of a whiskerless Schottky diode for millimeter and submillimeter wave applications

    NASA Astrophysics Data System (ADS)

    McKinney, K.; Mattaugh, R. J.; Bishop, W. L.

    1985-05-01

    Design considerations, fabrication techniques, and performance predictions are presented for a planar whiskerless Schottky diode to be used (in radio astronomy applications) at 100-300 GHz. The anode and ohmic contacts are on the same side of the device, and proton bombardment is used to establish the divided surface (by making some regions of the GaAs wafer semiinsulating) prior to definition of a B-doped SiO2 finger, ohmic contacting, anode formation, and anode contact metallization (all using photolithographic techniques). The contributions of parasitic elements are calculated for a device with a 3.5-micron-deep n(+) layer doped at 2 x 10 to the 18th/cu cm, a 250-nm-thick epitaxial layer doped at 5 x 10 to the 16th/cu cm, and a 1-micron-radius anode (providing zero-bias junction capacitance 7 fE). It is predicted that such a device would have total series resistance 12.58 ohm and total shunt capacitance 1.37 fF, compared with 14.27 ohm and 0.93 fF for the corresponding whiskered device.

  9. Design, fabrication, and performance of a whiskerless Schottky diode for millimeter and submillimeter wave applications

    NASA Technical Reports Server (NTRS)

    Mckinney, K.; Mattaugh, R. J.; Bishop, W. L.

    1985-01-01

    Design considerations, fabrication techniques, and performance predictions are presented for a planar whiskerless Schottky diode to be used (in radio astronomy applications) at 100-300 GHz. The anode and ohmic contacts are on the same side of the device, and proton bombardment is used to establish the divided surface (by making some regions of the GaAs wafer semiinsulating) prior to definition of a B-doped SiO2 finger, ohmic contacting, anode formation, and anode contact metallization (all using photolithographic techniques). The contributions of parasitic elements are calculated for a device with a 3.5-micron-deep n(+) layer doped at 2 x 10 to the 18th/cu cm, a 250-nm-thick epitaxial layer doped at 5 x 10 to the 16th/cu cm, and a 1-micron-radius anode (providing zero-bias junction capacitance 7 fE). It is predicted that such a device would have total series resistance 12.58 ohm and total shunt capacitance 1.37 fF, compared with 14.27 ohm and 0.93 fF for the corresponding whiskered device.

  10. A p-type-doped quantum dot superluminescent LED with broadband and flat-topped emission spectra obtained by post-growth intermixing under a GaAs proximity cap.

    PubMed

    Zhang, Z Y; Jiang, Q; Luxmoore, I J; Hogg, R A

    2009-02-04

    Broadband superluminescent light emitting diodes are realized by a post-growth annealing process, on modulation p-doped multiple InAs/InGaAs/GaAs quantum dot layer structures, under a GaAs proximity cap. The device exhibits a large and flat emission with spectral width up to 132 nm at 2 mW. This is mainly attributed to the reduction of the energy separation between the ground state and the excited state, in addition to the optical quality of the intermixed modulation p-doped quantum dot materials being comparable to that of the as-grown sample.

  11. Schottky barrier MOSFET systems and fabrication thereof

    DOEpatents

    Welch, J.D.

    1997-09-02

    (MOS) device systems-utilizing Schottky barrier source and drain to channel region junctions are disclosed. Experimentally derived results which demonstrate operation of fabricated N-channel and P-channel Schottky barrier (MOSFET) devices, and of fabricated single devices with operational characteristics similar to (CMOS) and to a non-latching (SRC) are reported. Use of essentially non-rectifying Schottky barriers in (MOS) structures involving highly doped and the like and intrinsic semiconductor to allow non-rectifying interconnection of, and electrical accessing of device regions is also disclosed. Insulator effected low leakage current device geometries and fabrication procedures therefore are taught. Selective electrical interconnection of drain to drain, source to drain, or source to source, of N-channel and/or P-channel Schottky barrier (MOSFET) devices formed on P-type, N-type and Intrinsic semiconductor allows realization of Schottky Barrier (CMOS), (MOSFET) with (MOSFET) load, balanced differential (MOSFET) device systems and inverting and non-inverting single devices with operating characteristics similar to (CMOS), which devices can be utilized in modulation, as well as in voltage controlled switching and effecting a direction of rectification. 89 figs.

  12. Schottky barrier MOSFET systems and fabrication thereof

    DOEpatents

    Welch, James D.

    1997-01-01

    (MOS) device systems-utilizing Schottky barrier source and drain to channel region junctions are disclosed. Experimentally derived results which demonstrate operation of fabricated N-channel and P-channel Schottky barrier (MOSFET) devices, and of fabricated single devices with operational characteristics similar to (CMOS) and to a non-latching (SRC) are reported. Use of essentially non-rectifying Schottky barriers in (MOS) structures involving highly doped and the like and intrinsic semiconductor to allow non-rectifying interconnection of, and electrical accessing of device regions is also disclosed. Insulator effected low leakage current device geometries and fabrication procedures therefore are taught. Selective electrical interconnection of drain to drain, source to drain, or source to source, of N-channel and/or P-channel Schottky barrier (MOSFET) devices formed on P-type, N-type and Intrinsic semiconductor allows realization of Schottky Barrier (CMOS), (MOSFET) with (MOSFET) load, balanced differential (MOSFET) device systems and inverting and non-inverting single devices with operating characteristics similar to (CMOS), which devices can be utilized in modulation, as well as in voltage controled switching and effecting a direction of rectification.

  13. GaAs thin film epitaxy and x-ray detector development

    NASA Astrophysics Data System (ADS)

    Wynne, Dawnelle I.; Cardozo, B.; Haller, Eugene E.

    1999-10-01

    We report on the growth of high purity n-GaAs using Liquid Phase Epitaxy and on the fabrication of Schottky barrier diodes for use as x-ray detectors using these layers. Our epilayers are grown form an ultra-pure Ga solvent in a graphite boat in a hydrogen atmosphere. Growth is started at a temperature of approximately 800 degrees C; the temperature is ramped down at 2 degrees C/min. to room temperature. Our best epilayers show a net-residual-donor concentration of approximately 2 X 1012 cm-3, measured by Hall effect. Electron mobilities as high as 150,000 cm2 V-1 s-1 at 77K have been obtained. The residual donors have been analyzed by far IR photothermal ionization spectroscopy and found to be sulfur and silicon. Up to approximately 200 micrometers of epitaxial GaAs have been deposited using several sequential growth runs on semi-insulating and n+-doped substrates. Schottky barrier diodes have been fabricated using this epitaxial material and have been electrically characterized by current-voltage and capacitance-voltage measurements. The Schottky barriers are formed by electron beam evaporation of Pt films. The ohmic contacts are made by electron beam evaporated and alloyed Ni-Ge-Au films on the backside of the substrate. Several of our diodes exhibit dark currents of the order of 0.3-3.3 nA/mm2 at reverse biases depleting approximately 50 micrometers of the epilayer. Electrical characteristics and preliminary performance results of our Schottky diodes using 109Cd and 241Am gamma and x- ray radiation will be discussed.

  14. Schottky barrier and homojunction gallium arsenide solar cells

    NASA Astrophysics Data System (ADS)

    Edweeb, M. E.

    1983-02-01

    New techniques were developed to construct Schottky barrier and homojunction solar cells on GaAs substrates. Schottky barrier metal semiconductor solar cells were produced for the first time on p-type GaAs substrate using a sputter deposition method to form the barrier. The sputter deposition of gold or gold/palladium is the key to the method since normal thermal evaporation of gold onto p-type GaAs produces ohmic contacts. The results of this investigation are consistent with the idea that sputter damage produces donor type surface states on GaAs. Barrier heights were measured for both p-type sputtered and n-type thermally evaporated diodes using current voltage and capacitance voltage methods. Deep level transient spectroscopy was used to identify the trap center concentration and energy levels for both diodes in an effort to explain the relatively dark current in the p-type sputtered diodes. Homojunction GaAs solar cells were fabricated using several techniques.

  15. Terahertz Sub-harmonic Mixer Using Discrete Schottky Diode for Planetary Science and Remote Sensing

    NASA Astrophysics Data System (ADS)

    Yang, F.; Meng, H. F.; Duo, W. B.; Sun, Z. L.

    2017-01-01

    Sub-harmonic mixers are the core element of terahertz room temperature, high spectral resolution heterodyne receivers for planetary science, and remote sensing. Here, terahertz sub-harmonic mixer up to 400 GHz using discrete Schottky diode is presented. Measured performance is in agreement with results from the linear and nonlinear co-simulations, and this methodology shows its practicability for the discrete planar GaAs Schottky diode-based terahertz core circuit design.

  16. Effect of defects due to lattice mismatch between GaAs and InP materials on gate-leakage current and microwave noise of GaAs MESFETS on InP substrates

    NASA Astrophysics Data System (ADS)

    Chertouk, Mourad; Boudiaf, A.; Azoulay, Rozette; Clei, A.

    1993-11-01

    The effect of traps due to lattice mismatch between GaAs and InP materials on the reverse current of Schottky diodes is demonstrated by the temperature dependence of the current, which exhibits a S.R.H. component at low reverse bias (also present in GaAs/GaAs with activation energy 0.125 eV) and a trap assisted tunneling one at high reverse bias (not observed in GaAs/GaAs). A model is developed which takes into account the temperature and channel doping level dependence. Application of this model to 0.25 micrometers gate GaAs MESFETs gives a good agreement with gate leakage current behavior as a function of drain and gate bias, for 6 X 1017 cm-3 and 1018 cm-3 channel doping. The excess gate-drain assisted tunneling current in 1018 cm-3 doped channel does not affect the MESFETs dc and microwave performances. However, the microwave noise (Fmin) is increased.

  17. The effects of the magnitude of the modulation field on electroreflectance spectroscopy of undoped-n+ type doped GaAs

    NASA Astrophysics Data System (ADS)

    Wang, D. P.; Huang, K. M.; Shen, T. L.; Huang, K. F.; Huang, T. C.

    1998-01-01

    The electroreflectance (ER) spectra of an undoped-n+ type doped GaAs has been measured at various amplitudes of modulating fields (δF). Many Franz-Keldysh oscillations were observed above the band gap energy, thus enabling the electric field (F) in the undoped layer to be determined. The F is obtained by applying fast Fourier transformation to the ER spectra. When δF is small, the power spectrum can be clearly resolved into two peaks, which corresponds to heavy- and light-hole transitions. When δF is less than ˜1/8 of the built-in field (Fbi˜77 420 V/cm), the F deduced from the ER is almost independent of δF. However, when larger than this, F is increased with δF. Also, when δF is increased to larger than ˜1/8 of Fbi, a shoulder appears on the right side of the heavy-hole peak of the power spectrum. The separation between the main peak and the shoulder of the heavy-hole peak becomes wider as δF becomes larger.

  18. Combined effects of the intense laser field, electric and magnetic fields on the optical properties of n-type double δ-doped GaAs quantum well

    NASA Astrophysics Data System (ADS)

    Sari, H.; Kasapoglu, E.; Sakiroglu, S.; Yesilgul, U.; Ungan, F.; Sökmen, I.

    2017-06-01

    In the present work, the effects of the non-resonant intense laser field, electric and magnetic fields on the optical properties, such as linear, third order nonlinear and the total optical absorption coefficient and refractive index changes associated with the intersubband transitions between the ground and the first excited states in the n-type double δ-doped GaAs quantum well is theoretically studied by solving the Schrödinger equation in the laser-dressed confinement potential within the framework of effective mass approximation. The analytical expressions of the linear and third-order nonlinear optical absorption coefficients and refractive index changes are obtained by using the compact-density matrix formalism. Our numerical results show that the optical absorption coefficient and refractive index change are quite sensitive to the applied external fields, such as non-resonant intense laser field, electric and magnetic fields. The obtained results can be applied for the design of various optoelectronic devices based on the intersubband transitions of electrons.

  19. Effect of quantum dot position and background doping on the performance of quantum dot enhanced GaAs solar cells

    SciTech Connect

    Driscoll, Kristina Bennett, Mitchell F.; Polly, Stephen J.; Forbes, David V.; Hubbard, Seth M.

    2014-01-13

    The effect of the position of InAs quantum dots (QD) within the intrinsic region of pin-GaAs solar cells is reported. Simulations suggest placing the QDs in regions of reduced recombination enables a recovery of open-circuit voltage (V{sub OC}). Devices with the QDs placed in the center and near the doped regions of a pin-GaAs solar cell were experimentally investigated. While the V{sub OC} of the emitter-shifted device was degraded, the center and base-shifted devices exhibited V{sub OC} comparable to the baseline structure. This asymmetry is attributed to background doping which modifies the recombination profile and must be considered when optimizing QD placement.

  20. TCAD analysis of graphene silicon Schottky junction solar cell

    NASA Astrophysics Data System (ADS)

    Kuang, Yawei; Liu, Yushen; Ma, Yulong; Xu, Jing; Yang, Xifeng; Feng, Jinfu

    2015-08-01

    The performance of graphene based Schottky junction solar cell on silicon substrate is studied theoretically by TCAD Silvaco tools. We calculate the current-voltage curves and internal quantum efficiency of this device at different conditions using tow dimensional model. The results show that the power conversion efficiency of Schottky solar cell dependents on the work function of graphene and the physical properties of silicon such as thickness and doping concentration. At higher concentration of 1e17cm-3 for n-type silicon, the dark current got a sharp rise compared with lower doping concentration which implies a convert of electron emission mechanism. The biggest fill factor got at higher phos doping predicts a new direction for higher performance graphene Schottky solar cell design.

  1. High Energy Neutron Irradiation Effects in GaAs Modulation-Doped Field Effect Transistors (MODFETS): Threshold Voltage

    DTIC Science & Technology

    1989-06-15

    PREFACE We would like to thank B. K. Janousek, W. E. Yamada, and L. W. Aukerman for their technical assistance in this study. Aceession For [iTIS CRA...Doped GaAs-(AlGa)As Heterostructures," Surface Science, 132, 519-526, (1983). 8. L. W. Aukerman , "Radiation-Produced Energy Levels in Compound Semi...conductors," J. Appl. Phys. LO, 1239-1243, (Aug. 1959). 9. L. W. Aukerman , "Radiation Effects," in Semiconductors and Semimetals: Physics of III-V

  2. Luminescence and Electroluminescence of Nd, Tm and Yb Doped GaAs and some II-Vi Compounds

    DTIC Science & Technology

    1994-02-28

    isoelectronic trap. We have evidence that II-VI semiconductors, ZnTe doped with oxygen -electron the other RE ions in IlI-V semiconductors can occupy traps...act as donors exciton. or acceptors. The important roles of oxygen on RE It has been well established that the "simple" isoelect- luminescence have...agreement with experimnt, over a wide rang of genration rates. T electric field InP:.Yb photoun~escence quenching was investigated and reported for the

  3. Electrochemical capacitance-voltage measurements and modeling of GaAs nanostructures with delta-doped layers

    NASA Astrophysics Data System (ADS)

    Shestakova, L.; Yakovlev, G.; Zubkov, V.

    2017-03-01

    The paper presents the results of electrochemical capacitance-voltage profiling and simulation of quantum-sized semiconductor structures with quantum wells and delta-doped layers based on gallium arsenide. The experimental ECV data were obtained by superposition of measured capacitance-voltage characteristics during the gradual etching of the nanostructure. As a result of simulation, the concentration distribution and energy lineups for structures with delta-layers and quantum wells in gallium arsenide were calculated. The results of simulation are in qualitative agreement with the experimental results and data found in literature.

  4. Photo-carrier and Electronic Studies of Silicon-Doped GaAs Grown by MBE Using PCR

    NASA Astrophysics Data System (ADS)

    Villada, J. A.; Jiménez-Sandoval, S.; López-López, M.; Mendoza, J.; Espinosa-Arbeláez, D. G.; Rodríguez-García, M. E.

    2010-05-01

    Photo-carrier radiometry (PCR) has been used to study the distribution of impurities and the lattice damage in silicon-doped gallium arsenide in a noncontact way. The results from the PCR study are correlated with Hall effect measurements. Samples for this study were grown by molecular beam epitaxy. Of all possible parameters that can be manipulated, the silicon effusion cell temperature was the only one that was varied, in order to obtain samples with different silicon concentrations. The distribution of impurities was obtained by scanning the surface of each sample. The PCR amplitude and phase images were obtained as a function of the x- y position. According to the PCR images, it is evident that the impurities are not uniformly distributed across the sample. From these images, the average value of the amplitude and phase data across the surface was obtained for each sample in order to study the PCR signal behavior as a function of the silicon effusion cell temperature.

  5. Coherent dynamics of Landau-Levels in modulation doped GaAs quantum wells at high magnetic fields

    NASA Astrophysics Data System (ADS)

    Liu, Cunming; Paul, Jagannath; Reno, John; McGill, Stephen; Hilton, David; Karaiskaj, Denis

    By using two-dimensional Fourier transform spectroscopy, we investigate the dynamics of Landau-Levels formed in modulation doped GaAs/AlGaAs quantum wells of 18 nm thickness at high magnetic fields and low temperature. The measurements show interesting dephasing dynamics and linewidth dependency as a function of the magnetic field. The work at USF and UAB was supported by the National Science Foundation under grant number DMR-1409473. The work at NHMFL, FSU was supported by the National Science Foundation under grant numbers DMR-1157490 and DMR-1229217. This work was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. Department of Energy, Office of Basic Energy Sciences user facility. Sandia National Laboratories is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's National Nuclear Security Administration under Contract No. DE-AC04-94AL85000.

  6. Multiple Applications of GaAs semiconductors

    NASA Astrophysics Data System (ADS)

    Martel, Jenrené; Wonka, Willy

    2003-03-01

    The object of this discussion will be to explore the many facets of Gallium Arsenide(GaAs) semiconductors. The session will begin with a brief overview of the basic properties of semiconductors in general(band gap, doping, charge mobility etc.). It will then follow with a closer look at the properties of GaAs and how these properties could potentially translate into some very exciting applications. Furthermore, current applications of GaAs semiconductors will be dicussed and analyzed. Finally, physical limits and advantages/disadvantages of GaAs will be considered.

  7. Infrared absorption properties of the EL2 and the isolated As/sub Ga/ defects in neutron-transmutation-doped GaAs: Generation of an EL2-like defect

    SciTech Connect

    Manasreh, M.O.; Fischer, D.W.

    1989-02-15

    The EL2 and the isolated As/sub Ga/ antisite defects in neutron-transmutation-doped (NTD) GaAs were studied by using the infrared (ir) absorption technique concurrent with thermal annealing. The results show that irradiation with low thermal-neutron doses partially decomposes the EL2 complex in semi-insulating (si) GaAs grown by the liquid-encapsulated Czochralski (LEC) growth technique. On the other hand, a small amount of EL2 is generated in as-grown Ga-rich undoped p-type LEC GaAs. The EL2 defect in low-dose thermal-neutron-irradiated samples (both si and p-type) was found to be stable up to 850 /sup 0/C. High neutron-irradiation doses, however, completely annihilate EL2 but generate a different EL2-like defect (DL2). The DL2 defect is observed after annealing the high-dose NTD samples for 6 min at 600 /sup 0/C. The DL2 concentration is observed to be larger than that of EL2 in as-grown LEC si GaAs by a factor of 2.3 or higher. The photoquenching and thermal recovery properties of DL2 and EL2 defects are identical. However, the DL2 defect does not exhibit the same thermal stability or the zero-phonon line of the EL2 defect. Thermal annealing kinetics shows that DL2 is composed of three point defects. The residual absorption (unquenchable component) after photoquenching the EL2 (DL2) defect is interpreted as the photoionization of the isolated As/sub Ga/ antisite.

  8. Photonic crystal cavities with metallic Schottky contacts

    SciTech Connect

    Quiring, W.; Al-Hmoud, M.; Reuter, D.; Zrenner, A.; Rai, A.; Wieck, A. D.

    2015-07-27

    We report about the fabrication and analysis of high Q photonic crystal cavities with metallic Schottky-contacts. The structures are based on GaAs n-i membranes with an InGaAs quantum well in the i-region and nanostructured low ohmic metal top-gates. They are designed for photocurrent readout within the cavity and fast electric manipulations. The cavity structures are characterized by photoluminescence and photocurrent spectroscopy under resonant excitation. We find strong cavity resonances in the photocurrent spectra and surprisingly high Q-factors up to 6500. Temperature dependent photocurrent measurements in the region between 4.5 K and 310 K show an exponential enhancement of the photocurrent signal and an external quantum efficiency up to 0.26.

  9. Silicon Carbide Schottky Barrier Diode

    NASA Technical Reports Server (NTRS)

    Zhao, Jian H.; Sheng, Kuang; Lebron-Velilla, Ramon C.

    2004-01-01

    This chapter reviews the status of SiC Schottky barrier diode development. The fundamental of Schottky barrier diodes is first provided, followed by the review of high-voltage SiC Schottky barrier diodes, junction-barrier Schottky diodes, and merged-pin-Schottky diodes. The development history is reviewed ad the key performance parameters are discussed. Applications of SiC SBDs in power electronic circuits as well as other areas such as gas sensors, microwave and UV detections are also presented, followed by discussion of remaining challenges.

  10. Characterization of Enhanced Schottky-Barrier InGaAs/AlxGa(1-x)As Strained Channel Modulation-Doped Field-Effect Transistors.

    DTIC Science & Technology

    1987-12-01

    or GM) Extrinsic transconductance mS gmo Intrinsic transconductance mS Gmax Maximum available power gain dB GMAX Maximum available power gain dB Gd...quantization, density, and mobility of the 2DEG in modulation-doped layers has been investigated and is expanded upon in the following three sub...to investigate the quantum ..’-:" mechanical effect on charge control in MODFETs [98]. A self-consistent quantum mechanical model was used to

  11. Impact of the epilayer doping on the performance of thin metal film Ni2Si/4H-SiC Schottky photodiodes

    NASA Astrophysics Data System (ADS)

    Mazzillo, M.; Sciuto, A.; Marchese, S.

    2014-12-01

    In the last few years silicon carbide (SiC) has emerged as a suitable material for the fabrication of ultraviolet light detectors due to lower leakage current, intrinsic visible blindness and mature process technology. In this paper we report on the electro-optical characteristics of continuous thin metal film Ni2Si/4H-SiC photodiodes with very low surface epilayer doping properly designed for ultraviolet (UV) sunlight monitoring.

  12. Spatial inhomogeneous barrier heights at graphene/semiconductor Schottky junctions

    NASA Astrophysics Data System (ADS)

    Tomer, Dushyant

    Graphene, a semimetal with linear energy dispersion, forms Schottky junction when interfaced with a semiconductor. This dissertation presents temperature dependent current-voltage and scanning tunneling microscopy/spectroscopy (STM/S) measurements performed on graphene Schottky junctions formed with both three and two dimensional semiconductors. To fabricate Schottky junctions, we transfer chemical vapor deposited monolayer graphene onto Si- and C-face SiC, Si, GaAs and MoS2 semiconducting substrates using polymer assisted chemical method. We observe three main type of intrinsic spatial inhomogeneities, graphene ripples, ridges and semiconductor steps in STM imaging that can exist at graphene/semiconductor junctions. Tunneling spectroscopy measurements reveal fluctuations in graphene Dirac point position, which is directly related to the Schottky barrier height. We find a direct correlation of Dirac point variation with the topographic undulations of graphene ripples at the graphene/SiC junction. However, no such correlation is established at graphene/Si and Graphene/GaAs junctions and Dirac point variations are attributed to surface states and trapped charges at the interface. In addition to graphene ripples and ridges, we also observe atomic scale moire patterns at graphene/MoS2 junction due to van der Waals interaction at the interface. Periodic topographic modulations due to moire pattern do not lead to local variation in graphene Dirac point, indicating that moire pattern does not contribute to fluctuations in electronic properties of the heterojunction. We perform temperature dependent current-voltage measurements to investigate the impact of topographic inhomogeneities on electrical properties of the Schottky junctions. We observe temperature dependence in junction parameters, such as Schottky barrier height and ideality factor, for all types of Schottky junctions in forward bias measurements. Standard thermionic emission theory which assumes a perfect

  13. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    DOE PAGES

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; ...

    2014-09-01

    The high balance-of-system costs of photovoltaic (PV) installations indicate that reductions in cell $/W costs alone are likely insufficient for PV electricity to reach grid parity unless energy conversion efficiency is also increased. Technologies which yield both high-efficiency cells (>25%) and maintain low costs are needed. GaAs and related III-V semiconductors are used in the highest-efficiency single- and multi-junction photovoltaics, but the technology is too expensive for non-concentrated terrestrial applications. This is due in part to the difficulty of scaling the metal-organic chemical vapor deposition (MOCVD) process, which relies on expensive reactors and employs toxic and pyrophoric gas-phase precursors suchmore » as arsine and trimethyl gallium, respectively. In this study, we describe GaAs films made by an alternative close-spaced vapor transport (CSVT) technique which is carried out at atmospheric pressure and requires only bulk GaAs, water vapor, and a temperature gradient in order to deposit crystalline films with similar electronic properties to that of GaAs deposited by MOCVD. CSVT is similar to the vapor transport process used to deposit CdTe thin films and is thus a potentially scalable low-cost route to GaAs thin films.« less

  14. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    SciTech Connect

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.

    2014-09-01

    The high balance-of-system costs of photovoltaic (PV) installations indicate that reductions in cell $/W costs alone are likely insufficient for PV electricity to reach grid parity unless energy conversion efficiency is also increased. Technologies which yield both high-efficiency cells (>25%) and maintain low costs are needed. GaAs and related III-V semiconductors are used in the highest-efficiency single- and multi-junction photovoltaics, but the technology is too expensive for non-concentrated terrestrial applications. This is due in part to the difficulty of scaling the metal-organic chemical vapor deposition (MOCVD) process, which relies on expensive reactors and employs toxic and pyrophoric gas-phase precursors such as arsine and trimethyl gallium, respectively. In this study, we describe GaAs films made by an alternative close-spaced vapor transport (CSVT) technique which is carried out at atmospheric pressure and requires only bulk GaAs, water vapor, and a temperature gradient in order to deposit crystalline films with similar electronic properties to that of GaAs deposited by MOCVD. CSVT is similar to the vapor transport process used to deposit CdTe thin films and is thus a potentially scalable low-cost route to GaAs thin films.

  15. Possibility of incongruous interface behavior of In on GaAs(110)

    NASA Astrophysics Data System (ADS)

    Chin, K. K.; Lindau, I.

    1985-11-01

    Photoemission spectroscopy has been used to study the Schottky-barrier formation of In on n- and p-type GaAs(110) interfaces. Our result is different from that reported by R. R. Daniels et al. [J. Vac. Sci. Technol. A 2(2), 831 (1984)]. It is suggested that this incongruous behavior of In on GaAs(110) is due to the kinetics of interface defect formation. Various experimental details which may affect the kinetics are also discussed.

  16. High efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1977-01-01

    Several oxidation techniques are discussed which have been found to increase the open circuit (V sub oc) of metal-GaAs Schottky barrier solar cells, the oxide chemistry, attempts to measure surface state parameters, the evolving characteristics of the solar cell as background contamination (has been decreased, but not eliminated), results of focused Nd/YAG laser beam recrystallization of Ge films evaporated onto tungsten, and studies of AMOS solar cells fabricated on sliced polycrystalline GaAs wafers. Also discussed are projected materials availability and costs for GaAs thin-film solar cells.

  17. Theoretical interpretation of Schottky barriers and ohmic contacts

    NASA Astrophysics Data System (ADS)

    Allen, Roland E.; Sankey, Otto F.; Dow, John D.

    1986-03-01

    We review a theory of Schottky barriers that explains the following experimental findings: (i) observed barrier heights and Fermi-level pinning positions for GaAs, InP, GaSb, AlAs, GaP, InAs, and other III-V semiconductors; (ii) switching of the observed barrier heights and Fermi-level pinning positions for III-V semiconductors as a function of surface treatment or reactivity of the metal; (iii) alloy dependence of Schottky barrier heights for the ternaries Al 1- xGa xAs, GaAs 1- xP x, Ga 1- xIn xP, InP 1- xAs x, and In 1- xGa xAs; (iv) different slopes d E/d x for different metal contacts to AlGaAs, and an apparent cusp in the slope for Al contacts as a function of alloy composition; (v) observed Schottky barriers for a wide variety of Si/transition-metal-silicide interfaces; (vi) observed barriers for Ge, diamond, and amorphous Si; (vii) observation that Fermi-level pinning for p-GaAs disappears at the annealing temperature of the antisite defect As Ga. The theory provides a microscopic realization of the phenomenological defect model of Spicer, Lindau and coworkers. We find that most Schottky barriers are explained by dangling bonds - intrinsic dangling bonds for group IV semiconductors and antisite (as well as intrinsic) dangling bonds for III-V semiconductors. Ohmic contacts are explained in the present picture by shallow levels, which are also predicted by the theory.

  18. InGaAs/InP heteroepitaxial Schottky barrier diodes for terahertz applications

    NASA Technical Reports Server (NTRS)

    Bhapkar, Udayan V.; Li, Yongjun; Mattauch, Robert J.

    1992-01-01

    This paper explores the feasibility of planar, sub-harmonically pumped, anti-parallel InGaAs/InP heteroepitaxial Schottky diodes for terahertz applications. We present calculations of the (I-V) characteristics of such diodes using a numerical model that considers tunneling. We also present noise and conversion loss predictions of diode mixers operated at 500 GHz, and obtained from a multi-port mixer analysis, using the I-V characteristics predicted by our model. Our calculations indicate that InGaAs/InP heteroepitaxial Schottky barrier diodes are expected to have an I-V characteristic with an ideality factor comparable to that of GaAs Schottky diodes. However, the reverse saturation current of InGaAs/InP diodes is expected to be much greater than that of GaAs diodes. These predictions are confirmed by experiment. The mixer analyses predict that sub-harmonically pumped anti-parallel InGaAs/InP diode mixers are expected to offer a 2 dB greater conversion loss and a somewhat higher single sideband noise temperature than their GaAs counterparts. More importantly, the InGaAs/InP devices are predicted to require only one-tenth of the local oscillator power required by similar GaAs diodes.

  19. Application of a Resistance Heater to the MOCVD (Metal-Organic Chemical Vapor Deposition) Growth of Undoped and Se-Doped GaAS.

    DTIC Science & Technology

    1985-03-08

    concentration and mobilities of the epitaxial layers were determined at room temperature and liquid-nitrogen temperature (77 K) by the van der Pauw technique’ for...mobility versus total impurity concentration for bulk GaAs (Ref. 7). 13 REFERENCES 1. van der Pauw , L. J., PhlisRes ep. 13, 1 (1958). 2. Binet, M., Electron

  20. INTERNATIONAL CONFERENCE ON SEMICONDUCTOR INJECTION LASERS SELCO-87: Doping inhomogeneities and behavior of compensation of n-type GaAs and InP

    NASA Astrophysics Data System (ADS)

    Wruck, D.; Knauer, A.

    1988-11-01

    A comparison was made of the distributions of Sn and of the chalcogens S and Se in InP and GaAs, determined from infrared absorption and the Hall effect. An analysis was made of the possible cause of the difference between the values of the degree of compensation determined by the two methods.

  1. A wide-band 760-GHz planar integrated Schottky receiver

    NASA Technical Reports Server (NTRS)

    Gearhart, Steven S.; Hesler, Jeffrey; Bishop, William L.; Crowe, Thomas W.; Rebeiz, Gabriel M.

    1993-01-01

    A wideband planar integrated heterodyne receiver has been developed for use at submillimeter-wave to FIR frequencies. The receiver consists of a log-periodic antenna integrated with a planar 0.8-micron GaAs Schottky diode. The monolithic receiver is placed on a silicon lens and has a measured room temperature double side-band conversion loss and noise temperature of 14.9 +/- 1.0 dB and 8900 +/- 500 K, respectively, at 761 GHz. These results represent the best performance to date for room temperature integrated receivers at this frequency.

  2. Current transport mechanism of p-GaN Schottky contacts

    NASA Astrophysics Data System (ADS)

    Shiojima, Kenji; Sugahara, Tomoya; Sakai, Shiro

    2000-12-01

    Transient measurements of I-V and depletion layer capacitance were conducted to clarify the leaky current flow mechanism in Ni Schottky contacts formed on Mg-doped p-GaN. We found that carrier capture and emission from acceptor-like deep level defects cause depletion layer width (Wdep) to vary significantly. Upon ionization of the defects by white light, which results in small Wdep, current can go through the Schottky barrier and a leaky I-V curve is observed. Upon filling by current injection, Wdep becomes larger and the large original Schottky barrier height is seen. The time constant of carrier emission is as long as 8.3×103 min.

  3. LEC GaAs for integrated circuit applications

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, C. G.; Chen, R. T.; Homes, D. E.; Asbeck, P. M.; Elliott, K. R.; Fairman, R. D.; Oliver, J. D.

    1984-01-01

    Recent developments in liquid encapsulated Czochralski techniques for the growth of semiinsulating GaAs for integrated circuit applications have resulted in significant improvements in the quality and quantity of GaAs material suitable for device processing. The emergence of high performance GaAs integrated circuit technologies has accelerated the demand for high quality, large diameter semiinsulating GaAs substrates. The new device technologies, including digital integrated circuits, monolithic microwave integrated circuits and charge coupled devices have largely adopted direct ion implantation for the formation of doped layers. Ion implantation lends itself to good uniformity and reproducibility, high yield and low cost; however, this technique also places stringent demands on the quality of the semiinsulating GaAs substrates. Although significant progress was made in developing a viable planar ion implantation technology, the variability and poor quality of GaAs substrates have hindered progress in process development.

  4. Schottky barrier formation and band bending revealed by first- principles calculations.

    PubMed

    Jiao, Yang; Hellman, Anders; Fang, Yurui; Gao, Shiwu; Käll, Mikael

    2015-06-12

    The formation of a Schottky barrier at the metal-semiconductor interface is widely utilised in semiconductor devices. With the emerging of novel Schottky barrier based nanoelectronics, a further microscopic understanding of this interface is in high demand. Here we provide an atomistic insight into potential barrier formation and band bending by ab initio simulations and model analysis of a prototype Schottky diode, i.e., niobium doped rutile titania in contact with gold (Au/Nb:TiO2). The local Schottky barrier height is found to vary between 0 and 1.26 eV depending on the position of the dopant. The band bending is caused by a dopant induced dipole field between the interface and the dopant site, whereas the pristine Au/TiO2 interface does not show any band bending. These findings open the possibility for atomic scale optimisation of the Schottky barrier and light harvesting in metal-semiconductor nanostructures.

  5. Schottky barrier formation and band bending revealed by first- principles calculations

    PubMed Central

    Jiao, Yang; Hellman, Anders; Fang, Yurui; Gao, Shiwu; Käll, Mikael

    2015-01-01

    The formation of a Schottky barrier at the metal-semiconductor interface is widely utilised in semiconductor devices. With the emerging of novel Schottky barrier based nanoelectronics, a further microscopic understanding of this interface is in high demand. Here we provide an atomistic insight into potential barrier formation and band bending by ab initio simulations and model analysis of a prototype Schottky diode, i.e., niobium doped rutile titania in contact with gold (Au/Nb:TiO2). The local Schottky barrier height is found to vary between 0 and 1.26 eV depending on the position of the dopant. The band bending is caused by a dopant induced dipole field between the interface and the dopant site, whereas the pristine Au/TiO2 interface does not show any band bending. These findings open the possibility for atomic scale optimisation of the Schottky barrier and light harvesting in metal-semiconductor nanostructures. PMID:26065401

  6. Evidence for field enhanced electron capture by EL2 centers in semi-insulating GaAs and the effect on GaAs radiation detectors

    SciTech Connect

    McGregor, D.S.; Rojeski, R.A.; Knoll, G.F. ); Terry, F.L. Jr.; East, J. ); Eisen, Y. )

    1994-06-15

    The performance of Schottky contact semiconductor radiation detectors fabricated from semi-insulating GaAs is highly sensitive to charged impurities and defects in the material. The observed behavior of semi-insulating GaAs Schottky barrier alpha particle detectors does not match well with models that treat the semi-insulating material as either perfectly intrinsic or as material with deep donors (EL2) of constant capture cross section compensated with shallow acceptors. We propose an explanation for the discrepancy based on enhanced capture of electrons by EL2 centers at high electric fields and the resulting formation of a quasineutral region in the GaAs. Presented is a simple model including field enhanced electron capture which shows good agreement with experimental alpha particle pulse height measurements.

  7. The Effect of Chemical Reactivity and Charge Transfer on Gallium-Arsenide (110) Schottky Barrier Formation.

    NASA Astrophysics Data System (ADS)

    Williams, Michael Duryea

    Transition and near noble metals have been deposited in sequential steps on atomically clean cleaved Gallium Arsenide (GaAs) surfaces under ultra-high vacuum conditions. Soft X-ray and ultra-violet photoemission spectroscopies were used to elucidate the room temperature (RT) chemistry and Fermi level pinning behaviors of these systems. The results show that the nature or degree of the chemical reaction has little effect on the Schottky barrier (SB) height of the metal-semiconductor contact. Silver (Ag), Gold (Au), Copper (Cu) and Palladium (Pd) for example, exhibit a range of chemical reactivities with the substrate going from non-reactive in the case of Ag to very reactive for Pd. These all have a SB height of 0.9 electron volts (eV) for n-type GaAs. Nickel (Ni), Chromium (Cr) and Titanium (Ti), on the other hand, also react strongly but have a SB height of 0.7 eV. The pinning position of the Fermi level at the interface for the established barrier (with the exception of the Ag contact) is also found to be independent of whether the substrate is doped n or p-type. An examination of trends in charge transfer parameters between the metal overlayer and the substrate has led to a strong correlation between the electronegativity (Pauling's scale) of the metal and the observed SB height. It is suggested that the formation of a dipole at the interface effects a charge transfer between the adatom induced defect levels and the metal overlayer consistent with charge neutrality. As a test, two additional sets of experiments were performed. The first is a study of Ytterbium (Yb) on the GaAs suabstrate. The unique chemistry of the rare earth metal provides further proof that the SB height is independent of chemistry. The second set of experiments is a kinetic study of the development of the Aluminum (Al)/GaAs SB. The RT and low temperature ((LESSTHEQ)-50(DEGREES)C) substrates show a significant variation in the pinning behavior of the interfacial Fermi level with coverage. The

  8. Role of electrode metallization in performance of semi-insulating GaAs radiation detectors

    NASA Astrophysics Data System (ADS)

    Dubecký, František; Boháček, Pavol; Sekáčová, Mária; Zaťko, Bohumír; Lalinský, Tibor; Linhart, Vladimír; Šagátová-Perd'ochová, Andrea; Mudroň, Ján; Pospíšil, Stanislav

    2007-06-01

    In the present work, a comparative study of semi-insulating (SI) GaAs radiation detectors with different blocking (Schottky) and ohmic contact metallization is presented. The detectors fabricated from "detector-grade" bulk SI GaAs are characterized by current-voltage measurements and their detection performance is evaluated from pulse-height spectra of 241Am and 57Co γ-sources. Observed results are evaluated and discussed. Importance of the optimized electrodes technology of SI GaAs detector with good performance is demonstrated.

  9. Cryogenic operation of GaAs based multiplier chains to 400 GHz

    NASA Technical Reports Server (NTRS)

    Maestrini, A.; Pukala, D.; Maiwald, F.; Schlecht, E.; Chattopadhyay, G.; Mehdi, I.

    2000-01-01

    The FIRST/HIFI mission allows for the local oscillator frequency multiplier chains to be cooled to 120 - 150 K in order to increase available output power. This paper will discuss the implication of cooling on GaAs based planar Schottky diode varactors for flight applications.

  10. Fullerene-based Schottky-junction organic solar cells: a brief review

    NASA Astrophysics Data System (ADS)

    Sutty, Sibi; Williams, Graeme; Aziz, Hany

    2014-01-01

    Recent advances in fullerene-based Schottky organic solar cells (OSCs) are presented, with a focus on the current understanding of device physics. Fullerene-based Schottky OSCs attain high open-circuit voltages due to the n-type Schottky junction formed between fullerene and an adjacent high work function anode. Small concentrations of donor material doped into the fullerene matrix serve as efficient exciton dissociation and hole transport agents that can substantially bolster short-circuit currents and fill factors. As a consequence, fullerene-based Schottky OSCs have been demonstrated to provide some of the highest-performance vacuum-deposited small molecule OSCs, with power conversion efficiencies up to 8.1%. Fullerene-based Schottky OSCs constructed using different donor materials and varying cathode buffer layers, as studied by a number of different research groups, are presented. To elucidate the differences between Schottky OSCs and more traditional bulk-heterojunction OSCs, we discuss the photophysics of fullerenes, the role of the donor material, and charge transport in low donor concentration active layers. Fullerene-based Schottky OSCs possess considerable advantages because they can reach high efficiencies with a simple structure using readily available and cost-effective materials. The impact and applicability of the Schottky device architecture on the field of organic photovoltaics at large are discussed.

  11. An integrated membrane sub-harmonic Schottky diode mixers at 340GHz

    NASA Astrophysics Data System (ADS)

    Wang, Junlong; Yang, Dabao; Xing, Dong; Liang, Shixiong; Zhang, Lisen; Zhao, Xiangyang; Feng, Zhihong

    2015-11-01

    This paper presents a sub-harmonic mixer operating over the spectral band 332-348 GHz. The mixers employ integrated GaAs membrane Schottky diode technology. The simulated results show that the conversion loss of the mixer is below dB in the band from 333 GHz to 347 GHz with a local oscillator power requirement of 5mW.The minimum is 8.2dB at 344GHz.

  12. Graphene/silicon nanowire Schottky junction for enhanced light harvesting.

    PubMed

    Fan, Guifeng; Zhu, Hongwei; Wang, Kunlin; Wei, Jinquan; Li, Xinming; Shu, Qinke; Guo, Ning; Wu, Dehai

    2011-03-01

    Schottky junction solar cells are assembled by directly coating graphene films on n-type silicon nanowire (SiNW) arrays. The graphene/SiNW junction shows enhanced light trapping and faster carrier transport compared to the graphene/planar Si structure. With chemical doping, the SiNW-based solar cells showed energy conversion efficiencies of up to 2.86% at AM1.5 condition, opening a possibility of using graphene/semiconductor nanostructures in photovoltaic application.

  13. A collection of Schottky-scan notes

    SciTech Connect

    Sabersky, A.P.

    1980-10-01

    This paper is a republication of ISR-RF notes and performance reports on work done in 1974-1975. The original notes have been edited, corrected and, in most cases, shortened. Discussed in this note are the following topics: noise, errors and the Schottky scan; speeding up the Schottky scan; Schottky markers and fast Schottky scans; and some engineering aspects of the fast Schottky scan.

  14. Effects of ultrathin oxides in conducting MIS structures on GaAs

    NASA Technical Reports Server (NTRS)

    Childs, R. B.; Ruths, J. M.; Sullivan, T. E.; Fonash, S. J.

    1978-01-01

    Schottky barrier-type GaAs baseline devices (semiconductor surface etched and then immediately metalized) and GaAs conducting metal oxide-semiconductor devices are fabricated and characterized. The baseline surfaces (no purposeful oxide) are prepared by a basic or an acidic etch, while the surface for the MIS devices are prepared by oxidizing after the etch step. The metallizations used are thin-film Au, Ag, Pd, and Al. It is shown that the introduction of purposeful oxide into these Schottky barrier-type structures examined on n-type GaAs modifies the barrier formation, and that thin interfacial layers can modify barrier formation through trapping and perhaps chemical reactions. For Au- and Pd-devices, enhanced photovoltaic performance of the MIS configuration is due to increased barrier height.

  15. Piezoelectric Response to Coherent Longitudinal and Transverse Acoustic Phonons in a Semiconductor Schottky Diode

    NASA Astrophysics Data System (ADS)

    Srikanthreddy, D.; Glavin, B. A.; Poyser, C. L.; Henini, M.; Lehmann, D.; Jasiukiewicz, Cz.; Akimov, A. V.; Kent, A. J.

    2017-02-01

    We study the generation of microwave electronic signals by pumping a (311) GaAs Schottky diode with compressive and shear acoustic phonons, generated by the femtosecond optical excitation of an Al film transducer and mode conversion at the Al-GaAs interface. They propagate through the substrate and arrive at the Schottky device on the opposite surface, where they induce a microwave electronic signal. The arrival time, the amplitude, and the polarity of the signals depend on the phonon mode. A theoretical analysis is made of the polarity of the experimental signals. This analysis includes the piezoelectric and deformation potential mechanisms of electron-phonon interaction in a Schottky contact and shows that the piezoelectric mechanism is dominant for both transverse and longitudinal modes with frequencies below 250 and 70 GHz, respectively.

  16. GaAs core--shell nanowires for photovoltaic applications.

    PubMed

    Czaban, Josef A; Thompson, David A; LaPierre, Ray R

    2009-01-01

    We report the use of Te as an n-type dopant in GaAs core-shell p-n junction nanowires for use in photovoltaic devices. Te produced significant change in the morphology of GaAs nanowires grown by the vapor-liquid-solid process in a molecular beam epitaxy system. The increase in radial growth of nanowires due to the surfactant effect of Te had a significant impact on the operating characteristics of photovoltaic devices. A decrease in solar cell efficiency occurred when the Te-doped GaAs growth duration was increased.

  17. The effect of the intense laser field on the electronic states and optical properties of n-type double δ-doped GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Kasapoglu, E.; Yesilgul, U.; Ungan, F.; Sökmen, I.; Sari, H.

    2017-02-01

    In this work, within the effective mass approximation we have performed a theoretical study of electronic states, the intersubband-related optical absorption coefficient and relative refractive index change properties in the GaAs-based double δ-doped quantum well under non-resonant intense laser field. By solving the Schrödinger equation in the laser-dressed confinement potential, we calculated eigenvalues and corresponding eigenfunctions as an intense laser parameter. We concluded that the separation between ground and first excited energy levels in the double δ-doped quantum well increases in energy by the increase of the laser field intensity and this effect leads to an optical blue-shift in intersubband transitions. Therefore a significant tunability of the optical transitions in double δ-doped quantum well can be achieved by modulating the intensity of the intense laser field.

  18. Tuning the Schottky barrier in the arsenene/graphene van der Waals heterostructures by electric field

    NASA Astrophysics Data System (ADS)

    Li, Wei; Wang, Tian-Xing; Dai, Xian-Qi; Wang, Xiao-Long; Ma, Ya-Qiang; Chang, Shan-Shan; Tang, Ya-Nan

    2017-04-01

    Using density functional theory calculations, we investigate the electronic properties of arsenene/graphene van der Waals (vdW) heterostructures by applying external electric field perpendicular to the layers. It is demonstrated that weak vdW interactions dominate between arsenene and graphene with their intrinsic electronic properties preserved. We find that an n-type Schottky contact is formed at the arsenene/graphene interface with a Schottky barrier of 0.54 eV. Moreover, the vertical electric field can not only control the Schottky barrier height but also the Schottky contacts (n-type and p-type) and Ohmic contacts (n-type) at the interface. Tunable p-type doping in graphene is achieved under the negative electric field because electrons can transfer from the Dirac point of graphene to the conduction band of arsenene. The present study would open a new avenue for application of ultrathin arsenene/graphene heterostructures in future nano- and optoelectronics.

  19. Carbon-Nanotube Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Manohara, Harish; Wong, Eric; Schlecht, Erich; Hunt, Brian; Siegel, Peter

    2006-01-01

    Schottky diodes based on semiconducting single-walled carbon nanotubes are being developed as essential components of the next generation of submillimeter-wave sensors and sources. Initial performance predictions have shown that the performance characteristics of these devices can exceed those of the state-of-the-art solid-state Schottky diodes that have been the components of choice for room-temperature submillimeter-wave sensors for more than 50 years. For state-of-the-art Schottky diodes used as detectors at frequencies above a few hundred gigahertz, the inherent parasitic capacitances associated with their semiconductor junction areas and the resistances associated with low electron mobilities limit achievable sensitivity. The performance of such a detector falls off approximately exponentially with frequency above 500 GHz. Moreover, when used as frequency multipliers for generating signals, state-of-the-art solid-state Schottky diodes exhibit extremely low efficiencies, generally putting out only micro-watts of power at frequencies up to 1.5 THz. The shortcomings of the state-of-the-art solid-state Schottky diodes can be overcome by exploiting the unique electronic properties of semiconducting carbon nanotubes. A single-walled carbon nanotube can be metallic or semiconducting, depending on its chirality, and exhibits high electron mobility (recently reported to be approx.= 2x10(exp 5)sq cm/V-s) and low parasitic capacitance. Because of the narrowness of nanotubes, Schottky diodes based on carbon nanotubes have ultra-small junction areas (of the order of a few square nanometers) and consequent junction capacitances of the order of 10(exp -18) F, which translates to cutoff frequency >5 THz. Because the turn-on power levels of these devices are very low (of the order of nano-watts), the input power levels needed for pumping local oscillators containing these devices should be lower than those needed for local oscillators containing state-of-the-art solid

  20. Photoluminescence properties of modulation-doped In{sub x}Al{sub 1–x}As/In{sub y}Ga{sub 1–y}As/In{sub x}Al{sub 1–x}As structures with strained inas and gaas nanoinserts in the quantum well

    SciTech Connect

    Galiev, G. B.; Vasil’evskii, I. S.; Klimov, E. A.; Klochkov, A. N.; Lavruhin, D. V.; Pushkarev, S. S.; Maltsev, P. P.

    2015-09-15

    The photoluminescence spectra of modulation-doped InAlAs/InGaAs/InAlAs heterostructures with quantum wells containing thin strained InAs and GaAs inserts are investigated. It is established that the insertion of pair InAs layers and/ or a GaAs transition barriers with a thickness of 1 nm into a quantum well leads to a change in the form and energy position of the photoluminescence spectra as compared with a uniform In{sub 0.53}Ga{sub 0.47}As quantum well. Simulation of the band structure shows that this change is caused by a variation in the energy and wave functions of holes. It is demonstrated that the use of InAs inserts leads to the localization of heavy holes near the InAs layers and reduces the energy of optical transitions, while the use of GaAs transition barriers can lead to inversion of the positions of the light- and heavy-hole subbands in the quantum well. A technique for separately controlling the light- and heavy-hole states by varying the thickness and position of the GaAs and InAs inserts in the quantum well is suggested.

  1. Schottky bipolar I-MOS: An I-MOS with Schottky electrodes and an open-base BJT configuration for reduced operating voltage

    NASA Astrophysics Data System (ADS)

    Kannan, N.; Kumar, M. Jagadesh

    2017-04-01

    In this paper, we have proposed a novel impact ionization MOS (I-MOS) structure, called the Schottky bipolar I-MOS, with Schottky source and drain electrodes and utilizing the open-base bipolar junction transistor (BJT) configuration for achieving reduction in the operating voltage of the I-MOS transistor. We report, using 2-D simulations, a low operating voltage (∼1.1 V) and a low subthreshold swing (∼3.6 mV/Decade). For the corresponding p-i-n I-MOS, the operating voltage is ∼5.5 V. The operating voltage of the Schottky bipolar I-MOS is the lowest reported operating voltage for silicon based I-MOS transistors. The nearly 80% reduction in the operating voltage of the Schottky bipolar I-MOS makes it suitable for applications requiring low operating voltages. The Schottky bipolar I-MOS is also expected to have an improved reliability over the p-i-n I-MOS since high energy carriers, induced by impact ionization near the drain, do not have to pass under the gate region in the channel. The use of Schottky contacts instead of heavily doped source and drain regions and the low channel doping level reduces the required thermal budget for device fabrication. The low operating voltage, low subthreshold swing and possibly improved reliability of the Schottky bipolar I-MOS, makes it a potential solution for applications where steep subthreshold slope transistors are being explored as alternative to the conventional MOS transistor.

  2. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    SciTech Connect

    Hathwar, Raghuraj; Dutta, Maitreya; Chowdhury, Srabanti; Goodnick, Stephen M.; Koeck, Franz A. M.; Nemanich, Robert J.

    2016-06-14

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco{sup ®} Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures.

  3. Temperature dependent simulation of diamond depleted Schottky PIN diodes

    NASA Astrophysics Data System (ADS)

    Hathwar, Raghuraj; Dutta, Maitreya; Koeck, Franz A. M.; Nemanich, Robert J.; Chowdhury, Srabanti; Goodnick, Stephen M.

    2016-06-01

    Diamond is considered as an ideal material for high field and high power devices due to its high breakdown field, high lightly doped carrier mobility, and high thermal conductivity. The modeling and simulation of diamond devices are therefore important to predict the performances of diamond based devices. In this context, we use Silvaco® Atlas, a drift-diffusion based commercial software, to model diamond based power devices. The models used in Atlas were modified to account for both variable range and nearest neighbor hopping transport in the impurity bands associated with high activation energies for boron doped and phosphorus doped diamond. The models were fit to experimentally reported resistivity data over a wide range of doping concentrations and temperatures. We compare to recent data on depleted diamond Schottky PIN diodes demonstrating low turn-on voltages and high reverse breakdown voltages, which could be useful for high power rectifying applications due to the low turn-on voltage enabling high forward current densities. Three dimensional simulations of the depleted Schottky PIN diamond devices were performed and the results are verified with experimental data at different operating temperatures

  4. Isoelectronic co-doping

    DOEpatents

    Mascarenhas, Angelo

    2004-11-09

    Isoelectronic co-doping of semiconductor compounds and alloys with deep acceptors and deep donors is used to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, N and Bi, to customize solar cells, thermal voltaic cells, light emitting diodes, photodetectors, and lasers on GaP, InP, GaAs, Ge, and Si substrates. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  5. Low-leakage p-type diamond Schottky diodes prepared using vacuum ultraviolet light/ozone treatment

    SciTech Connect

    Teraji, T.; Garino, Y.; Koide, Y.; Ito, T.

    2009-06-15

    Room-temperature fabrication of Schottky diodes was demonstrated for p-type boron-doped diamond. This fabrication method's key technique is selective modification of surface termination from monohydride into oxygen groups using vacuum ultraviolet light irradiation in oxygen. The Au contacts, formed on the hydrogen-terminated surface, maintained Ohmic properties after this selective surface oxidation. The Au contacts then deposited on the oxidized surface, imparting Schottky properties. The lateral-type diodes comprising Au Schottky contacts and Au Ohmic contacts showed blocking voltage higher than 1 kV without electrode guarding. The leakage current at 1 kV was as low as 30 pA.

  6. The Stark effect on a bound hole in δ-acceptor doped GaAs/ Al xGa 1- xAs heterostructures

    NASA Astrophysics Data System (ADS)

    Łusakowski, J.; Friedland, K. J.; Ploog, K.

    2007-05-01

    There are only a few experimental reports on measurements of the Stark effect on shallow acceptors. We show that measurements of the degree of circular polarization of the luminescence originating from a free-to-bound Γ6→Γ8 transition allows us to determine the dipole moment of a substitutional acceptor in a crystal of Td symmetry. We suggest the performance of such experiments in a single GaAs/GaAlAs heterostructure δ-doped with acceptors. Thus we propose an experimental method for investigation of the Stark effect in solids.

  7. 670-GHz Schottky Diode-Based Subharmonic Mixer with CPW Circuits and 70-GHz IF

    NASA Technical Reports Server (NTRS)

    Chattopadhyay, Goutam; Schlecht, Erich T.; Lee, Choonsup; Lin, Robert H.; Gill, John J.; Mehdi, Imran; Sin, Seth; Deal, William; Loi, Kwok K.; Nam, Peta; hide

    2012-01-01

    GaAs-based, sub-harmonically pumped Schottky diode mixers offer a number of advantages for array implementation in a heterodyne receiver system. Since the radio frequency (RF) and local oscillator (LO) signals are far apart, system design becomes much simpler. A proprietary planar GaAs Schottky diode process was developed that results in very low parasitic anodes that have cutoff frequencies in the tens of terahertz. This technology enables robust implementation of monolithic mixer and frequency multiplier circuits well into the terahertz frequency range. Using optical and e-beam lithography, and conventional epitaxial layer design with innovative usage of GaAs membranes and metal beam leads, high-performance terahertz circuits can be designed with high fidelity. All of these mixers use metal waveguide structures for housing. Metal machined structures for RF and LO coupling hamper these mixers to be integrated in multi-pixel heterodyne array receivers for spectroscopic and imaging applications. Moreover, the recent developments of terahertz transistors on InP substrate provide an opportunity, for the first time, to have integrated amplifiers followed by Schottky diode mixers in a heterodyne receiver at these frequencies. Since the amplifiers are developed on a planar architecture to facilitate multi-pixel array implementation, it is quite important to find alternative architecture to waveguide-based mixers.

  8. Intense laser field effects on the intersubband optical absorption and refractive index change in the δ -doped GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Sari, H.; Yesilgul, U.; Ungan, F.; Sakiroglu, S.; Kasapoglu, E.; Sökmen, I.

    2017-04-01

    In this paper, we have investigated the effects of the non-resonant intense laser field on the electronic and optical properties such as linear, nonlinear and the total optical absorption coefficient and refractive index change for transitions between two lower-lying electronic states in the GaAs-based δ -doped quantum well. Within the effective mass approximation, we calculated the eigenvalues and corresponding eigenfunctions as a function of the intense laser parameter by solving the Schrödinger equation in the laser-dressed confinement potential. The analytical expressions of the linear and third-order non-linear optical absorption coefficients and refractive index changes are obtained by using the compact-density matrix formalism. The obtained results show that the separation between ground and first excited energy levels in the δ -doped quantum well decreases in energy by the increase of the laser field intensity and this effect leads to an optical red-shift in the intersubband transitions. This behavior gives us a new degree of freedom in tunability of different device applications based on the optical transitions.

  9. Plastic Schottky barrier solar cells

    DOEpatents

    Waldrop, James R.; Cohen, Marshall J.

    1984-01-24

    A photovoltaic cell structure is fabricated from an active medium including an undoped, intrinsically p-type organic semiconductor comprising polyacetylene. When a film of such material is in rectifying contact with a magnesium electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates the magnesium layer on the undoped polyacetylene film.

  10. Electrodeposition of Metal on GaAs Nanowires

    NASA Astrophysics Data System (ADS)

    Liu, Chao; Einabad, Omid; Watkins, Simon; Kavanagh, Karen

    2010-10-01

    Copper (Cu) electrical contacts to freestanding gallium arsenide (GaAs) nanowires have been fabricated via electrodeposition. The nanowires are zincblende (111) oriented grown epitaxially on n-type Si-doped GaAs (111)B substrates by gold-catalyzed Vapor Liquid Solid (VLS) growth in a metal organic vapour phase epitaxy (MOVPE) reactor. The epitaxial electrodeposition process, based on previous work with bulk GaAs substrates, consists of a substrate oxide pre-etch in dilute ammonium-hydroxide carried out prior to galvanostatic electrodeposition in a pure Cu sulphate aqueous electrolyte at 20-60^oC. For GaAs nanowires, we find that Cu or Fe has a preference for growth on the gold catalyst avoiding the sidewalls. After removing gold, both metals still prefer to grow only on top of the nanowire, which has the largest potential field.

  11. Electronic structure computation and differential capacitance profile in δ-doped FET as a function of hydrostatic pressure

    SciTech Connect

    Carlos-Pinedo, C.; Rodríguez-Vargas, I.; Martínez-Orozco, J. C.

    2014-05-15

    In this work we present the results obtained from the calculation of the level structure of a n-type delta-doped well Field Effect Transistor when is subjected to hydrostatic pressure. We study the energy level structure as a function of hydrostatic pressure within the range of 0 to 6 kbar for different Schottky barrier height (SBH). We use an analytical expression for the effect of hydrostatic pressure on the SBH and the pressure dependence of the basic parameters of the system as the effective mass m(P) and the dielectric constant ε(P) of GaAs. We found that due to the effects of hydrostatic pressure, in addition to electronic level structure alteration, the profile of the differential capacitance per unit area C{sup −2} is affected.

  12. Measurements of Effective Schottky Barrier in Inverse Extraordinary Optoconductance Structures

    NASA Astrophysics Data System (ADS)

    Tran, L. C.; Werner, F. M.; Solin, S. A.; Gilbertson, Adam; Cohen, L. F.

    2013-03-01

    Individually addressable optical sensors with dimensions as low as 250nm, fabricated from metal semiconductor hybrid structures (MSH) of AuTi-GaAs Schottky interfaces, display a transition from resistance decreasing with intensity in micron-scale sensors (Extraordinary Optoconductance, EOC) to resistance increasing with intensity in nano-scale sensors (Inverse Extraordinary Optoconductance I-EOC). I-EOC is attributed to a ballistic to diffusive crossover with the introduction of photo-induced carriers and gives rise to resistance changes of up to 9462% in 250nm devices. We characterize the photo-dependence of the effective Schottky barrier in EOC/I-EOC structures by the open circuit voltage and reverse bias resistance. Under illumination by a 5 mW, 632.8 nm HeNe laser, the barrier is negligible and the Ti-GaAs interface becomes Ohmic. Comparing the behavior of two devices, one with leads exposed, another with leads covered by an opaque epoxy, the variation in Voc with the position of the laser can be attributed to a photovoltaic effect of the lead metal and bulk GaAs. The resistance is unaffected by the photovoltaic offset of the leads, as indicated by the radial symmetry of 2-D resistance maps obtained by rastering a laser across EOC/IEOC devices. SAS has a financial interest in PixelEXX, a start-up company whose mission is to market imaging arrays.

  13. Fabrication and Characterization of n-AlGaAs/GaAs Schottky Diode for Rectenna Device Application

    NASA Astrophysics Data System (ADS)

    Parimon, Norfarariyanti; Mustafa, Farahiyah; Manaf Hashim, Abdul; Fadzli Abd Rahman, Shaharin; Rahman, Abdul Rahim Abdul; Nizam Osman, Mohd

    2011-02-01

    Schottky diode was designed and fabricated on n-AlGaAs/GaAs high electron mobility transistor (HEMT) structure for rectenna device application. Rectenna is one of the most potential devices to form the wireless power supply which is really good at converting microwaves to DC. The processing steps used in the fabrication of Schottky diode were the conventional steps used in standard GaAs processing. Current-voltage (I-V) measurements showed that the device had rectifying properties with a barrier height of 0.5468 eV for Ni/Au metallization. The fabricated Schottky diode detected RF signals and the cut-off frequency up to 20 GHz was estimated in direct injection experiments. These preliminary results will provide a breakthrough for the direct integration with antenna towards realization of rectenna device application.

  14. Delta-doping of Semiconductors

    NASA Astrophysics Data System (ADS)

    Schubert, E. F.

    2005-08-01

    Part I: 1. Introduction E. F. Schubert; Part II: 2. Electronic structure of delta-doped semiconductors C. R. Proetto; Part III: 3. Recent progress in delta-like confinement of impurities in GaAs K. H. Ploog; 4. Flow-rate modulation epitaxy (FME) of III-V semiconductors T. Makimoto and Y. Horikoshi; 5. Gas source molecular beam epitaxy (MBE) of delta-doped III-V semiconductors D. Ritter; 6. Solid phase epitaxy for delta-doping in silicon I. Eisele; 7. Low temperature MBE of silicon H.-J. Gossmann; Part IV: 8. Secondary ion mass spectrometry of delta-doped semiconductors H. S. Luftmann; 9. Capacitance-voltage profiling E. F. Schubert; 10. Redistribution of impurities in III-V semiconductors E. F. Schubert; 11. Dopant diffusion and segregation in delta-doped silicon films H.-J. Gossmann; 12. Characterisation of silicon and delta-doped structures in GaAs R. C. Newman; 13. The DX-center in silicon delta-doped GaAs and AlxGa1-xAs P. M. Koenraad; Part V: 14. Luminescence and ellipsometry spectroscopy H. Yao and E. F. Schubert; 15. Photoluminescence and Raman spectroscopy of single delta-doped III-V semiconductor heterostructures J. Wagner and D. Richards; 16. Electron transport in delta-doped quantum wells W. T. Masselink; 17. Electron mobility in delta-doped layers P. M. Koenraad; 18. Hot electrons in delta-doped GaAs M. Asche; 19. Ordered delta-doping R. L. Headrick, L. C. Feldman and B. E. Weir; Part IV: 20. Delta-doped channel III-V field effect transistors (FETs) W.-P. Hong; 21. Selectively doped heterostructure devices E. F. Schubert; 22. Silicon atomic layer doping FET K. Nakagawa and K. Yamaguchi; 23. Planar doped barrier devices R. J. Malik; 24. Silicon interband and intersubband photodetectors I. Eisele; 25. Doping superlattice devices E. F. Schubert.

  15. Enzyme-Based Lactic Acid Detection Using Algaas/gaas High Electron Mobility Transistor with Sb-Doped Zno Nanowires Grown on the Gate Region

    NASA Astrophysics Data System (ADS)

    Ma, Siwei; Huang, Yunhua; Liu, Hanshuo; Zhang, Xiaohui; Liao, Qingliang

    2012-08-01

    Sb-doped ZnO nanowires were synthesized via chemical vapor deposition method. Scanning electron microscopic, transmission electron microscopic, X-ray diffraction and energy dispersive spectrometer have been used to characterize the morphology and structure of the nanowires. The AlGaAs/GaAs HEMT drain-source current exhibited a fast response of about 1s when different concentrations of lactic acid solutions were added to the surface of lactate oxidase immobilized on the ZnO nanowires. The HEMT could detect a range of lactic acid concentrations from 3 pM to 30 μM. The biosensor exhibited good performance along with fast response, high sensitivity, and long-term stability. Our results demonstrate the possibility of using AlGaAs/GaAs HEMTs for lactic acid measurements and provide new further fundamental insights into the study of nanoscience and nanodevices.

  16. Development and characterization of zone melt growth GaAs for gamma-ray detectors

    SciTech Connect

    King, S.E.; Dietrich, H.B.; Henry, R.L.; Katzer, D.S.; Moore, W.J.; Phillips, G.W.; Mania, R.C.

    1996-06-01

    GaAs is a potentially attractive material for room temperature x-ray and {gamma}-ray spectrometers. To date, the only high resolution GaAs devices were produced by epitaxial growth. The usefulness of detectors made from bulk grown semi-insulating (SI) GaAs has been limited by low charge collection efficiency caused, it is believed, by the high density of EL2 deep donor defects. Vertical zone melt (VZM) growth of GaAs has recently been developed at the Naval Research Laboratory. Zone refining and zone leveling techniques were used with VZM to reduce the level of impurities and the EL2 defects in bulk SI-GaAs. Schottky barrier and PIN diodes have been fabricated from the newly grown material. These devices were characterized using {alpha} particles and {gamma}-rays. In this paper, the measurements and analysis of the first VZM GaAs devices are presented and compared with commercially available GaAs. The intent is to test the hypothesis that high purity, low defect GaAs material growth could lead to improved radiation detectors.

  17. InP and GaAs characterization with variable stoichiometry obtained by molecular spray

    NASA Technical Reports Server (NTRS)

    Massies, J.; Linh, N. T.; Olivier, J.; Faulconnier, P.; Poirier, R.

    1979-01-01

    Both InP and GaAs surfaces were studied in parallel. A molecular spray technique was used to obtain two semiconductor surfaces with different superficial compositions. The structures of these surfaces were examined by electron diffraction. Electron energy loss was measured spectroscopically in order to determine surface electrical characteristics. The results are used to support conclusions relative to the role of surface composition in establishing a Schottky barrier effect in semiconductor devices.

  18. Optimized design of 4H-SiC floating junction power Schottky barrier diodes

    NASA Astrophysics Data System (ADS)

    Hongbin, Pu; Lin, Cao; Zhiming, Chen; Jie, Ren

    2009-04-01

    SiC floating junction Schottky barrier diodes were simulated with software MEDICI 4.0 and their device structures were optimized based on forward and reverse electrical characteristics. Compared with the conventional power Schottky barrier diode, the device structure is featured by a highly doped drift region and embedded floating junction region, which can ensure high breakdown voltage while keeping lower specific on-state resistance, solved the contradiction between forward voltage drop and breakdown voltage. The simulation results show that with optimized structure parameter, the breakdown voltage can reach 4 kV and the specific on-resistance is 8.3 mΩ·cm2.

  19. Positively charged manganese acceptor disclosed by photoluminescence spectra in an n-i-p-i-n heterostructure with a Mn-doped GaAs base

    NASA Astrophysics Data System (ADS)

    Shen, C.; Wang, L. G.; Zheng, H. Z.; Zhu, H.; Chen, L.; Zhao, J. H.

    2011-05-01

    A type of manganese impurity center with two holes bound in it is disclosed in a lightly Mn-doped base layer of an n-i-p-i-n heterostructure. In addition to the intensively investigated (e, AMn0) peak, a photoluminescence (PL) peak appears at 820.3 nm under zero bias and is continuously shifted to 822.5 nm by negatively biasing the structure. Its circular polarization has the same polarity as PL (e, AMn0), and has a magnetic dependence fitted by a paramagnetic Brillouin function with S = 1/2 and g = 2.09. These observations are consistent with the physical picture that in the AMn+ center both the - 3/2 and the - 1/2 holes occupy the lowest 1S hydrogenic orbit with their spins parallel to each other and antiparallel to the 5/2 local spin of the 3d shell. This spin coupling picture in the AMn+ center has been confirmed by a modified numerical calculation based upon effective mass theory. The feature of the ability to tune the impurity level of the AMn+ center makes it attractive for optically and electrically manipulating local magnetic spins in semiconductors.

  20. First principles study of bismuth alloying effects in GaAs saturable absorber.

    PubMed

    Li, Dechun; Yang, Ming; Zhao, Shengzhi; Cai, Yongqing; Feng, Yuanping

    2012-05-07

    First principles hybrid functional calculations have been carried out to study electronic properties of GaAs with Bi alloying effects. It is found that the doping of Bi into GaAs reduces the bandgap due to the intraband level repulsions between Bi induced states and host states, and the Bi-related impurity states originate from the hybridization of Bi-6p and its nearest As-4p orbitals. With the increase of Bi concentration in GaAs, the bandgap decreases monotonously. The calculated optical properties of the undoped and Bi-doped GaAs are similar except the shift toward lower energy of absorption edge and main absorption peaks with Bi doping. These results suggest a promising application of GaBi(x)As(1-x) alloy as semiconductor saturable absorber in Q-switched or mode-locked laser.

  1. Energy harvesting efficiency in GaN nanowire-based nanogenerators: the critical influence of the Schottky nanocontact.

    PubMed

    Jamond, Nicolas; Chrétien, Pascal; Gatilova, Lina; Galopin, Elisabeth; Travers, Laurent; Harmand, Jean-Christophe; Glas, Frank; Houzé, Frédéric; Gogneau, Noëlle

    2017-03-30

    The performances of 1D-nanostructure based nanogenerators are governed by the ability of nanostructures to efficiently convert mechanical deformation into electrical energy, and by the efficiency with which this piezo-generated energy is harvested. In this paper, we highlight the crucial influence of the GaN nanowire-metal Schottky nanocontact on the energy harvesting efficiency. Three different metals, p-type doped diamond, PtSi and Pt/Ir, have been investigated. By using an atomic force microscope equipped with a Resiscope module, we demonstrate that the harvesting of piezo-generated energy is up to 2.4 times more efficient using a platinum-based Schottky nanocontact compared to a doped diamond-based nanocontact. In light of Schottky contact characteristics, we evidence that the conventional description of the Schottky diode cannot be applied. The contact is governed by its nanometer size. This specific behaviour induces notably a lowering of the Schottky barrier height, which gives rise to an enhanced conduction. We especially demonstrate that this effective thinning is directly correlated with the improvement of the energy harvesting efficiency, which is much pronounced for Pt-based Schottky diodes. These results constitute a building block to the overall improvement of NW-based nanogenerator devices.

  2. New approach to the design of Schottky barrier diodes for THz mixers

    NASA Technical Reports Server (NTRS)

    Jelenski, A.; Grueb, A.; Krozer, V.; Hartnagel, H. L.

    1992-01-01

    Near-ideal GaAs Schottky barrier diodes especially designed for mixing applications in the THz frequency range are presented. A diode fabrication process for submicron diodes with near-ideal electrical and noise characteristics is described. This process is based on the electrolytic pulse etching of GaAs in combination with an in-situ platinum plating for the formation of the Schottky contacts. Schottky barrier diodes with a diameter of 1 micron fabricated by the process have already shown excellent results in a 650 GHz waveguide mixer at room temperature. A conversion loss of 7.5 dB and a mixer noise temperature of less than 2000 K have been obtained at an intermediate frequency of 4 GHz. The optimization of the diode structure and the technology was possible due to the development of a generalized Schottky barrier diode model which is valid also at high current densities. The common diode design and optimization is discussed on the basis of the classical theory. However, the conventional fomulas are valid only in a limited forward bias range corresponding to currents much smaller than the operating currents under submillimeter mixing conditions. The generalized new model takes into account not only the phenomena occurring at the junction such as current dependent recombination and drift/diffusion velocities, but also mobility and electron temperature variations in the undepleted epi-layer. Calculated diode I/V and noise characteristics are in excellent agreement with the measured values. Thus, the model offers the possibility of optimizing the diode structure and predicting the diode performance under mixing conditions at THz frequencies.

  3. Phthalocyanine based Schottky solar cells

    NASA Astrophysics Data System (ADS)

    Kwong, Chung Yin; Djurisic, Aleksandra B.; Lam, Lillian S. M.; Chan, Wai Kin

    2003-02-01

    Phthalocyanine (Pc) materials are commonly used in organic solar cells. Four different phthalocyanines, nickel phthalocyanine (NiPc), copper phthalocyanine (CuPc), iron phthalocyanine (FePc), and cobalt phthalocyanine (CoPc) have been investigated for organic solar cell applications. The devices consisted of indium tin oxide (ITO) coated lass substrate, Pc layer, and aluminum (al) electrode. It has been found that ITO/CuPc/Al Schottky cell exhibits the best performance. To investigate the influence of the active layer thickness on the cell performance, cells with several different thicknesses were fabricated and optimal value was found. Schottky cell exhibits optimal performance with one ohmic and one barrier contact. However, it is suspected that ITO/CuPc contact is not ohmic. Therefore, we have investigated various ITO surface treatments for improving the performance of CuPc based Schottky solar cell. We have found that cell on ITO treated with HCl and UV-ozone exhibits the best performance. AM1 power conversion efficiency can be improved by 30% compared to cell made with untreated ITO substrate. To improve power conversion efficiency, double or multiplayer structure are required, and it is expected that suitable ITO treatments for those devices will further improve their performance by improving the contact between ITO and phthalocyanine layer.

  4. 670 GHz Schottky Diode Based Subharmonic Mixer with CPW Circuits and 70 GHz IF

    NASA Technical Reports Server (NTRS)

    Chattopadhyay, Goutam (Inventor); Schlecht, Erich T. (Inventor); Lee, Choonsup (Inventor); Lin, Robert H. (Inventor); Gill, John J. (Inventor); Sin, Seth (Inventor); Mehdi, Imran (Inventor)

    2014-01-01

    A coplanar waveguide (CPW) based subharmonic mixer working at 670 GHz using GaAs Schottky diodes. One example of the mixer has a LO input, an RF input and an IF output. Another possible mixer has a LO input, and IF input and an RF output. Each input or output is connected to a coplanar waveguide with a matching network. A pair of antiparallel diodes provides a signal at twice the LO frequency, which is then mixed with a second signal to provide signals having sum and difference frequencies. The output signal of interest is received after passing through a bandpass filter tuned to the frequency range of interest.

  5. Ti/Pd/Ag Contacts to n-Type GaAs for High Current Density Devices

    NASA Astrophysics Data System (ADS)

    Huo, Pengyun; Rey-Stolle, Ignacio

    2016-06-01

    The metallization stack Ti/Pd/Ag on n-type Si has been readily used in solar cells due to its low metal/semiconductor specific contact resistance, very high sheet conductance, bondability, long-term durability, and cost-effectiveness. In this study, the use of Ti/Pd/Ag metallization on n-type GaAs is examined, targeting electronic devices that need to handle high current densities and with grid-like contacts with limited surface coverage (i.e., solar cells, lasers, or light emitting diodes). Ti/Pd/Ag (50 nm/50 nm/1000 nm) metal layers were deposited on n-type GaAs by electron beam evaporation and the contact quality was assessed for different doping levels (from 1.3 × 1018 cm-3 to 1.6 × 1019 cm-3) and annealing temperatures (from 300°C to 750°C). The metal/semiconductor specific contact resistance, metal resistivity, and the morphology of the contacts were studied. The results show that samples doped in the range of 1018 cm-3 had Schottky-like I- V characteristics and only samples doped 1.6 × 1019 cm-3 exhibited ohmic behavior even before annealing. For the ohmic contacts, increasing annealing temperature causes a decrease in the specific contact resistance ( ρ c,Ti/Pd/Ag ~ 5 × 10-4 Ω cm2). In regard to the metal resistivity, Ti/Pd/Ag metallization presents a very good metal conductivity for samples treated below 500°C ( ρ M,Ti/Pd/Ag ~ 2.3 × 10-6 Ω cm); however, for samples treated at 750°C, metal resistivity is strongly degraded due to morphological degradation and contamination in the silver overlayer. As compared to the classic AuGe/Ni/Au metal system, the Ti/Pd/Ag system shows higher metal/semiconductor specific contact resistance and one order of magnitude lower metal resistivity.

  6. The role of Schottky barrier in the resistive switching of SrTiO3: direct experimental evidence.

    PubMed

    Yin, Xue-Bing; Tan, Zheng-Hua; Guo, Xin

    2015-01-07

    Single crystalline SrTiO3 doped with 0.1 wt% Nb was used as a model system to evaluate the role of the Schottky barrier in the resistive switching of perovskites. The Ti bottom electrode formed an ohmic contact in the Ni/Nb:SrTiO3/Ti stack, whereas the Ni top electrode created a strong Schottky barrier, which was reflected in a huge semi-circle in the impedance spectrum of the stack. Bipolar switching was achieved in the voltage range of -4 to 4 V for the stack, two clear resistance states were created by electric pulses, and the Schottky barrier heights corresponding to the high/low resistance states were experimentally determined. A direct relationship between the resistance state and the Schottky barrier height was thus established.

  7. Zr/oxidized diamond interface for high power Schottky diodes

    SciTech Connect

    Traoré, A. Muret, P.; Fiori, A.; Eon, D.; Gheeraert, E.; Pernot, J.

    2014-02-03

    High forward current density of 10{sup 3} A/cm{sup 2} (at 6 V) and a breakdown field larger than 7.7 MV/cm for diamond diodes with a pseudo-vertical architecture, are demonstrated. The power figure of merit is above 244 MW/cm{sup 2} and the relative standard deviation of the reverse current density over 83 diodes is 10% with a mean value of 10{sup −9} A/cm{sup 2}. These results are obtained with zirconium as Schottky contacts on the oxygenated (100) oriented surface of a stack comprising an optimized lightly boron doped diamond layer on a heavily boron doped one, epitaxially grown on a Ib substrate. The origin of such performances are discussed.

  8. Planar GaAs diodes for THz frequency mixing applications

    NASA Technical Reports Server (NTRS)

    Bishop, William L.; Crowe, Thomas W.; Mattauch, Robert J.; Dossal, Hasan

    1992-01-01

    Schottky barrier diodes for terahertz applications are typically fabricated as a micron to sub-micron circular anode metallization on GaAs which is contacted with a sharp wire (whisker). This structure has the benefits of the simplicity of the fabrication of the diode chip, the minimal shunt capacitance of the whisker contact and the ability of the whisker wire to couple energy to the diode. However, whisker-contacted diodes are costly to assembly and difficult to qualify for space applications. Also, complex receiver systems which require many diodes are difficult to assemble. The objective of this paper is to discuss the advantages of planar Schottky diodes for high frequency receiver applications and to summarize the problems of advancing the planar technology to the terahertz frequency range. Section 2 will discuss the structure, fabrication and performance of state-of-the-art planar Schottky diodes. In Section 3 the problems of designing and fabricating planar diodes for terahertz frequency operation are discussed along with a number of viable solutions. Section 4 summarizes the need for further research and cooperation between diode designers and RF engineers.

  9. Method of Making Self-Aligned GAAS/ALGAAS FET’s.

    DTIC Science & Technology

    having a predetermined crystalline structure is obtained having a heavily doped top GaAs layer, having a heavily doped AlGaAs layer under the top layer...recess is wider at the base of the recess than at the top of the recess because of the predetermined crystalline structure and the orientation-dependent

  10. Graphitized carbon on GaAs(100) substrates

    SciTech Connect

    Simon, J.; Simmonds, P. J.; Lee, M. L.; Woodall, J. M.

    2011-02-14

    We report on the formation of graphitized carbon on GaAs(100) surfaces by molecular beam epitaxy. We grew highly carbon-doped GaAs on AlAs, which was then thermally etched in situ leaving behind carbon atoms on the surface. After thermal etching, Raman spectra revealed characteristic phonon modes for sp{sup 2}-bonded carbon, consistent with the formation of graphitic crystallites. We estimate that the graphitic crystallites are 1.5-3 nm in size and demonstrate that crystallite domain size can be increased through the use of higher etch temperatures.

  11. Analysing black phosphorus transistors using an analytic Schottky barrier MOSFET model.

    PubMed

    Penumatcha, Ashish V; Salazar, Ramon B; Appenzeller, Joerg

    2015-11-13

    Owing to the difficulties associated with substitutional doping of low-dimensional nanomaterials, most field-effect transistors built from carbon nanotubes, two-dimensional crystals and other low-dimensional channels are Schottky barrier MOSFETs (metal-oxide-semiconductor field-effect transistors). The transmission through a Schottky barrier-MOSFET is dominated by the gate-dependent transmission through the Schottky barriers at the metal-to-channel interfaces. This makes the use of conventional transistor models highly inappropriate and has lead researchers in the past frequently to extract incorrect intrinsic properties, for example, mobility, for many novel nanomaterials. Here we propose a simple modelling approach to quantitatively describe the transfer characteristics of Schottky barrier-MOSFETs from ultra-thin body materials accurately in the device off-state. In particular, after validating the model through the analysis of a set of ultra-thin silicon field-effect transistor data, we have successfully applied our approach to extract Schottky barrier heights for electrons and holes in black phosphorus devices for a large range of body thicknesses.

  12. Analysing black phosphorus transistors using an analytic Schottky barrier MOSFET model

    PubMed Central

    Penumatcha, Ashish V.; Salazar, Ramon B.; Appenzeller, Joerg

    2015-01-01

    Owing to the difficulties associated with substitutional doping of low-dimensional nanomaterials, most field-effect transistors built from carbon nanotubes, two-dimensional crystals and other low-dimensional channels are Schottky barrier MOSFETs (metal-oxide-semiconductor field-effect transistors). The transmission through a Schottky barrier-MOSFET is dominated by the gate-dependent transmission through the Schottky barriers at the metal-to-channel interfaces. This makes the use of conventional transistor models highly inappropriate and has lead researchers in the past frequently to extract incorrect intrinsic properties, for example, mobility, for many novel nanomaterials. Here we propose a simple modelling approach to quantitatively describe the transfer characteristics of Schottky barrier-MOSFETs from ultra-thin body materials accurately in the device off-state. In particular, after validating the model through the analysis of a set of ultra-thin silicon field-effect transistor data, we have successfully applied our approach to extract Schottky barrier heights for electrons and holes in black phosphorus devices for a large range of body thicknesses. PMID:26563458

  13. Analysing black phosphorus transistors using an analytic Schottky barrier MOSFET model

    NASA Astrophysics Data System (ADS)

    Penumatcha, Ashish V.; Salazar, Ramon B.; Appenzeller, Joerg

    2015-11-01

    Owing to the difficulties associated with substitutional doping of low-dimensional nanomaterials, most field-effect transistors built from carbon nanotubes, two-dimensional crystals and other low-dimensional channels are Schottky barrier MOSFETs (metal-oxide-semiconductor field-effect transistors). The transmission through a Schottky barrier-MOSFET is dominated by the gate-dependent transmission through the Schottky barriers at the metal-to-channel interfaces. This makes the use of conventional transistor models highly inappropriate and has lead researchers in the past frequently to extract incorrect intrinsic properties, for example, mobility, for many novel nanomaterials. Here we propose a simple modelling approach to quantitatively describe the transfer characteristics of Schottky barrier-MOSFETs from ultra-thin body materials accurately in the device off-state. In particular, after validating the model through the analysis of a set of ultra-thin silicon field-effect transistor data, we have successfully applied our approach to extract Schottky barrier heights for electrons and holes in black phosphorus devices for a large range of body thicknesses.

  14. Electrical and structural characterization of GaAs on InP grown by OMCVD; application to GaAs MESFETs

    NASA Astrophysics Data System (ADS)

    Azoulay, R.; Clei, A.; Dugrand, L.; Draïdia, auN.; Leroux, G.; Biblemont, S.

    1991-01-01

    The growth of GaAs on InP has attracted considerable interest recently because of the possibility of integration of GaAs electronic devices and 1.3 μm optical devices on the same wafer. In this work, we have investigated the growth of GaAs MESFETs and doped channel MIS-like FETs on InP by atmospheric pressure OMCVD. Because of the difference between the thermal expansion coefficient of GaAs and InP, the layers are under biaxial strain. The lowest FWHM of the (004) reflection curve of the double crystal X-ray diffraction spectra is 110 arc sec for a 12 μm thick layer. We have investigated the influence of the substrate temperature and of the arsine molar fraction on the residual carrier concentration of layers grown side by side on GaAs and on InP. The GaAs layers grown on InP are much more compensated than the layers grown on GaAs, indicating a higher incorporation of impurities. On MESFETs grown on InP, gm = 200mS/mm with Fmax higher than 30 GHz. On doped-channel MIS-like FETs on InP, we have measured gm = 145mS/mm.

  15. Comparisons of GaAs, tungsten, and photoresist etch rates and GaAs surfaces using RIE with CF/sub 4/, CF/sub 4/ + N/sub 2/, and SF/sub 6/ + N/sub 2/ mixtures

    SciTech Connect

    Susa, N.

    1985-11-01

    Etch rates for GaAs, tungsten, and photoresist were compared using CF/sub 4/, CF/sub 4/ + N/sub 2/, and SF/sub 6/ + N/sub 2/ gases. Etch rate ratio between the W and photoresist can be increased by N/sub 2/ gas addition, with a negligibly low GaAs etch rate. GaAs surfaces exposed to CF/sub 4/ + N/sub 2/ or SF/sub 6/ + N/sub 2/ plasmas were characterized by means of photoluminescence (PL), Schottky contacts, secondary ion mass spectroscopy (SIMS), and Auger electron spectroscopy (AES). The PL intensity measurements and Schottky characteristics revealed that the damage to the GaAs surface was somewhat smaller than that caused by pure CF/sub 4/ gas. The AES and SIMS measurements showed that the change in Ga/As composition after reactive ion etching was negligibly small. Results of heat-treatment are also described. Curious annealing characteristics were observed in the CF/sub 4/ + N/sub 2/, suggesting the existence of GaN.

  16. Thickness Dependence of Current Conduction and Carrier Distribution of GaAsN Grown on GaAs

    NASA Astrophysics Data System (ADS)

    Chen, Jenn-Fang; Hsiao, Ru-Shang; Hsieh, Ming-Ta; Huang, Wen-Di; Guo, P. S.; Lee, Wei-I; Lee, Shih-Chang; Lee, Chi-Ling

    2005-10-01

    Thickness dependence of the properties of GaAsN grown on GaAs was investigated by characterizing GaAs/GaAs0.982N0.018/GaAs Schottky diodes by current-voltage (I-V), capacitance-voltage (C-V) profiling and deep-level transient spectroscopy (DLTS). I-V characteristics show a considerable increase in the saturation current when the GaAsN thickness is increased from 60 to 250 Å. As GaAsN thickness is increased further, the I-V characteristic deviates from that of a normal Schottky diode with a large series resistance. These I-V characteristics correlate well with carrier distribution. In thick GaAsN samples, C-V profiling shows carrier depletion in the top GaAs layer and frequency-dispersion accumulation in the GaAsN layer. DLTS spectra show that the carrier depletion in the top GaAs layer is due to an EL2 trap and the frequency-dispersion accumulation is due to the removal of electrons from a trap at 0.35 eV in the GaAsN layer. Increasing the GaAsN thickness markedly increases the magnitude of both traps. The large series resistance in thick GaAsN samples is due to EL2 that markedly depletes the top GaAs layer.

  17. Interface demarcation in GaAs by current pulsing

    NASA Technical Reports Server (NTRS)

    Matthiesen, D. H.; Kafalas, J. A.; Duchene, G. A.; Bellows, A. H.

    1990-01-01

    GTE Laboratories is currently conducting a program to investigate the effect of convection in the melt on the properties of bulk grown gallium arsenide (GaAs). In addition to extensive ground based experimentation, a Get Away Special growth system has been developed to grow two GaAs crystals aboard the Space Shuttle, each with a one inch diameter. In order to perform a complete segregation analysis of the crystals grown in space, it is necessary to measure the interface shape and growth rate as well as the spatial distribution of the selenium dopant. The techniques for interface demarcation in selenium doped GaAs by current pulsing have been developed at GTE Laboratories and successful interface demarcation has been achieved for current pulses ranging from 20 to 90 amps, in both single crystal and polycrystalline regions.

  18. Interface demarcation in GaAs by current pulsing

    NASA Technical Reports Server (NTRS)

    Matthiesen, D. H.; Kafalas, J. A.; Duchene, G. A.; Bellows, A. H.

    1990-01-01

    GTE Laboratories is currently conducting a program to investigate the effect of convection in the melt on the properties of bulk grown gallium arsenide (GaAs). In addition to extensive ground based experimentation, a Get Away Special growth system has been developed to grow two GaAs crystals aboard the Space Shuttle, each with a one inch diameter. In order to perform a complete segregation analysis of the crystals grown in space, it is necessary to measure the interface shape and growth rate as well as the spatial distribution of the selenium dopant. The techniques for interface demarcation in selenium doped GaAs by current pulsing have been developed at GTE Laboratories and successful interface demarcation has been achieved for current pulses ranging from 20 to 90 amps, in both single crystal and polycrystalline regions.

  19. Cubic GaS: A Surface Passivator For GaAs

    NASA Technical Reports Server (NTRS)

    Hepp, Aloysius F.; Barron, Andrew R.; Power, Michael B.; Jenkins, Phillip P.; Macinnes, Andrew N.

    1994-01-01

    Thin films of cubic form of gallium sulfide (GaS) formed on surfaces of gallium arsenide (GaAs) substrates via metal/organic chemical vapor deposition (MOCVD). Deposited cubic GaS, crystalline lattice matched to substrate GaAs, neutralizes electrically active defects on surfaces of both n-doped and p-doped GaAs. Enabling important GaAs-based semiconducting materials to serve as substrates for metal/insulator/semiconductor (MIS) capacitors. Cubic GaS enables fabrication of ZnSe-based blue lasers and light-emitting diodes. Because GaS is optically transparent, deposited to form window layers for such optoelectronic devices as light-emitting diodes, solar optical cells, and semiconductor lasers. Its transparency makes it useful as interconnection material in optoelectronic integrated circuits. Also useful in peeled-film technology because selectively etched from GaAs.

  20. Formation of Schottky-type metal/SrTiO3 junctions and their resistive properties

    NASA Astrophysics Data System (ADS)

    Stöcker, Hartmut; Zschornak, Matthias; Seibt, Juliane; Hanzig, Florian; Wintz, Susi; Abendroth, Barbara; Kortus, Jens; Meyer, Dirk C.

    2010-08-01

    Motivated by the successful use of strontium titanate with different doping metals for memory cells on the basis of resistive switching and the recent findings on the major importance of oxygen vacancy redistribution in this compound, the present work shows the possibility of a non-volatile resistance change memory based on vacancy-doped SrTiO3. The formation of corresponding metal/SrTiO3- δ junctions ( δ>0) in an electric field will be discussed as well as the switching between ohmic and Schottky-type contact behavior. A notable hysteresis in the current-voltage characteristics is used to carry out Write, Read, and Erase operations exemplifying the memory cell properties of such junctions. But whereas the electric field-induced formation of Schottky-type junctions is explainable by oxygen vacancy redistribution, the resistive switching needs to be discussed in terms of vacancies serving as electron trap states at the metal/oxide interface.

  1. Contact mechanisms and design principles for Schottky contacts to group-III nitrides

    NASA Astrophysics Data System (ADS)

    Mohammad, S. Noor

    2005-03-01

    Contact mechanisms and design principles for Schottky contacts to group-III nitrides have been studied. These contacts, made generally by using simple principles and past experiences, suffer from serious drawbacks. The importance of various parameters such as surface morphology, surface treatment, metal/semiconductor interactions at the interface, thermal stability, minimization of doping by metal deposition and etching, elimination of edge electric field, etc., for them has been thoroughly investigated. Several design principles have been proposed. Both theoretical and experimental data have been presented to justify the validity of the proposed contact mechanisms and design principles. While theoretical calculations provide fundamental physics underlying heavy doping, leakage, etc., the experimental data provide verification of the contact mechanisms and design principles. The proposed principles are general enough to be applicable to most, if not all, Schottky contacts.

  2. Investigation of ZnSe-coated silicon substrates for GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Huber, Daniel A.; Olsen, Larry C.; Dunham, Glen; Addis, F. William

    1993-01-01

    Studies are being carried out to determine the feasibility of using ZnSe as a buffer layer for GaAs solar cells grown on silicon. This study was motivated by reports in the literature indicating ZnSe films had been grown by metallorganic chemical vapor deposition (MOCVD) onto silicon with EPD values of 2 x 10(exp 5) cm(sup -2), even though the lattice mismatch between silicon and ZnSe is 4.16 percent. These results combined with the fact that ZnSe and GaAs are lattice matched to within 0.24 percent suggest that the prospects for growing high efficiency GaAs solar cells onto ZnSe-coated silicon are very good. Work to date has emphasized development of procedures for MOCVD growth of (100) ZnSe onto (100) silicon wafers, and subsequent growth of GaAs films on ZnSe/Si substrates. In order to grow high quality single crystal GaAs with a (100) orientation, which is desirable for solar cells, one must grow single crystal (100) ZnSe onto silicon substrates. A process for growth of (100) ZnSe was developed involving a two-step growth procedure at 450 C. Single crystal, (100) GaAs films were grown onto the (100) ZnSe/Si substrates at 610 C that are adherent and specular. Minority carrier diffusion lengths for the GaAs films grown on ZnSe/Si substrates were determined from photoresponse properties of Al/GaAs Schottky barriers. Diffusion lengths for n-type GaAs films are currently on the order of 0.3 microns compared to 2.0 microns for films grown simultaneously by homoepitaxy.

  3. Ferromagnetic GaAs structures with single Mn delta-layer fabricated using laser deposition.

    PubMed

    Danilov, Yuri A; Vikhrova, Olga V; Kudrin, Alexey V; Zvonkov, Boris N

    2012-06-01

    The new technique combining metal-organic chemical vapor epitaxy with laser ablation of solid targets was used for fabrication of ferromagnetic GaAs structures with single Mn delta-doped layer. The structures demonstrated anomalous Hall effect, planar Hall effect, negative and anisotropic magnetoresistance in temperature range of 10-35 K. In GaAs structures with only single Mn delta-layer (without additional 2D hole gas channel or quantum well) ferromagnetism was observed for the first time.

  4. Monte Carlo simulation of electron drift velocity in low-temperature-grown gallium arsenide in a Schottky-barrier model

    NASA Astrophysics Data System (ADS)

    Arifin, P.; Goldys, E.; Tansley, T. L.

    1995-08-01

    We present a method of simulating the electron transport in low-temperature-grown GaAs by the Monte Carlo method. Low-temperature-grown GaAs contains microscopic inclusions of As and these inhomogeneities render impossible the standard Monte Carlo mobility simulations. Our method overcomes this difficulty and allows the quantitative prediction of electron transport on the basis of principal microscopic material parameters, including the impurity and the precipitate concentrations and the precipitate size. The adopted approach involves simulations of a single electron trajectory in real space, while the influence of As precipitates on the GaAs matrix is treated in the framework of a Schottky-barrier model. The validity of this approach is verified by evaluation of the drift velocity in homogeneous GaAs where excellent agreement with other workers' results is reached. The drift velocity as a function of electric field in low-temperature-grown GaAs is calculated for a range of As precipitate concentrations. Effect of compensation ratio on drift velocity characteristics is also investigated. It is found that the drift velocity is reduced and the electric field at which the onset of the negative differential mobility occurs increases as the precipitate concentration increases. Both these effects are related to the reduced electron mean free path in the presence of precipitates. Additionally, comparatively high low-field electron mobilities in this material are theoretically explained.

  5. Schottky Noise and Beam Transfer Functions

    SciTech Connect

    Blaskiewicz, M.

    2016-12-01

    Beam transfer functions (BTF)s encapsulate the stability properties of charged particle beams. In general one excites the beam with a sinusoidal signal and measures the amplitude and phase of the beam response. Most systems are very nearly linear and one can use various Fourier techniques to reduce the number of measurements and/or simulations needed to fully characterize the response. Schottky noise is associated with the finite number of particles in the beam. This signal is always present. Since the Schottky current drives wakefields, the measured Schottky signal is influenced by parasitic impedances.

  6. Ballistic Electron Emission Microscopy (BEEM) of Au/Al/GaAs Schottky barriers under Ultra High Vacuum conditions

    NASA Astrophysics Data System (ADS)

    Mani, R. G.; Narayanamurti, V.

    2000-03-01

    BEEM investigations of the Au/GaAs system have reported substantial redirection of the ballistic current into the L-valley of GaAs, based on a study of the I-V spectroscopic measurement. The result has been attributed to the absence of conservation of interface parallel wave-vector in the non-epitaxial Au/GaAs system. Theory has modeled the effect and it suggests an interesting scenario based on a progressive redistribution of the ballistic current between the relevant bands as a function of scattering strength at the interface. Experiments reported here attempt to investigate this regime by examining BEEM in Au/Al/GaAs Schottky barrier devices that preserve the topographic image of Au at the metal surface, while changing the metal semiconductor interface by placing Al between the surface Au surface layer and the GaAs substrate. As aluminum has been reported to grow epitaxially on GaAs, this approach has been pursued here in the hopes of realizing a metal-semiconductor device with varying degree of interfacial order depending upon growth conditions. Thus, we have fabricated Au/Al/GaAs Schottky barrier devices in a three chamber UHV system and subsequently carried out BEEM measurements between 90 K and 300 K. Collector current images and spectroscopic results obtained in such specimens will be compared with expectations based on relevant theory in order to obtain possible new insight into interface scattering in metal semiconductor structures.

  7. Direct probing of Schottky barriers in Si nanowire Schottky barrier field effect transistors.

    PubMed

    Martin, Dominik; Heinzig, Andre; Grube, Matthias; Geelhaar, Lutz; Mikolajick, Thomas; Riechert, Henning; Weber, Walter M

    2011-11-18

    This work elucidates the role of the Schottky junction in the electronic transport of nanometer-scale transistors. In the example of Schottky barrier silicon nanowire field effect transistors, an electrical scanning probe technique is applied to examine the charge transport effects of a nanometer-scale local top gate during operation. The results prove experimentally that Schottky barriers control the charge carrier transport in these devices. In addition, a proof of concept for a reprogrammable nonvolatile memory device based on band bending at the Schottky barriers will be shown.

  8. Incorporation of the dopants Si and Be into GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Hilse, M.; Ramsteiner, M.; Breuer, S.; Geelhaar, L.; Riechert, H.

    2010-05-01

    We studied the doping with Si and Be of GaAs nanowires (NWRs) grown by molecular beam epitaxy. Regarding the NW morphology, no influence was observed for Si doping but high Be doping concentrations cause a kinking and tapering of the NWRs. We investigated local vibrational modes by means of resonant Raman scattering to determine the incorporation sites of the dopant atoms. For Si doping, both donors on Ga sites and acceptors on As sites have been observed. Be was found to be incorporated as an acceptor on Ga sites. However, at high doping concentration, Be is also incorporated on interstitial sites.

  9. Gate tunable graphene-silicon Ohmic/Schottky contacts

    NASA Astrophysics Data System (ADS)

    Chen, Chun-Chung; Chang, Chia-Chi; Li, Zhen; Levi, A. F. J.; Cronin, Stephen B.

    2012-11-01

    We show that the I-V characteristics of graphene-silicon junctions can be actively tuned from rectifying to Ohmic behavior by electrostatically doping the graphene with a polymer electrolyte gate. Under zero applied gate voltage, we observe rectifying I-V characteristics, demonstrating the formation of a Schottky junction at the graphene-silicon interface. Through appropriate gating, the Fermi energy of the graphene can be varied to match the conduction or valence band of silicon, thus forming Ohmic contacts with both n- and p-type silicon. Over the applied gate voltage range, the low bias conductance can be varied by more than three orders of magnitude. By varying the top gate voltage from -4 to +4 V, the Fermi energy of the graphene is shifted between -3.78 and -5.47 eV; a shift of ±0.85 eV from the charge neutrality point. Since the conduction and valence bands of the underlying silicon substrate lie within this range, at -4.01 and -5.13 eV, the Schottky barrier height and depletion width can be decreased to zero for both n- and p-type silicon under the appropriate top gating conditions. I-V characteristics taken under illumination show that the photo-induced current can be increased or decreased based on the graphene-silicon work function difference.

  10. Vacancy-associated Te sites in GaAs

    NASA Astrophysics Data System (ADS)

    Wuyts, K.; Langouche, G.; van Rossum, M.; Silverans, R. E.

    1992-03-01

    Defect structures, observed by 129I Mössbauer spectroscopy in high-dose Te-doped GaAs, are identified by a reference study of the semiconducting compound Ga2Te3. The formation of TeAs-VGa complexes (tellurium atoms quasisubstitutional on an As site with a gallium vacancy in the first-neighbor shell) is proposed, in agreement with theoretical predictions. The relevance of this assignment in relation to the earlier proposed Te DX configuration is also discussed.

  11. Al/Ti contacts to Sb-doped p-type ZnO

    NASA Astrophysics Data System (ADS)

    Mandalapu, L. J.; Xiu, F. X.; Yang, Z.; Liu, J. L.

    2007-07-01

    Sb-doped p-type ZnO film was grown on Si (100) substrate by molecular-beam epitaxy. Al/Ti metal was evaporated on the ZnO film to form contacts. As-deposited contacts were Schottky with a barrier height of 0.8 eV. Ohmic conduction was achieved after thermal annealing. The different combinations of Ohmic and Schottky contacts on Sb-doped ZnO layer led to metal-semiconductor-metal (MSM), Schottky, and photoconductive devices. Ohmic contacts on Sb-doped p-type ZnO and backside of n-type Si substrate formed a heterojunction diode. MSM, Schottky, and photoconductor devices exhibited typical electrical characteristics, however, inverted rectification was observed for heterojunction diodes. All devices exhibited ultraviolet (UV) photoresponse. Secondary ion mass spectroscopy measurements were performed on the Ohmic and Schottky contacts on Sb-doped ZnO film to trace the metal profiles before and after annealing. Mechanisms of the formation of Schottky and Ohmic contacts to Sb-doped p-type ZnO and their device operation principles are discussed. This work suggests that Al/Ti can be used as both Ohmic and Schottky contacts to Sb-doped p-type ZnO for UV detection applications.

  12. Graphene-Based Reversible Nano-Switch/Sensor Schottky Diode

    NASA Technical Reports Server (NTRS)

    Miranda, Felix A.; Meador, Michael A.; Theofylaktos, Onoufrios; Pinto, Nicholas J.; Mueller, Carl H.; Santos-Perez, Javier

    2010-01-01

    This proof-of-concept device consists of a thin film of graphene deposited on an electrodized doped silicon wafer. The graphene film acts as a conductive path between a gold electrode deposited on top of a silicon dioxide layer and the reversible side of the silicon wafer, so as to form a Schottky diode. By virtue of the two-dimensional nature of graphene, this device has extreme sensitivity to different gaseous species, thereby serving as a building block for a volatile species sensor, with the attribute of having reversibility properties. That is, the sensor cycles between active and passive sensing states in response to the presence or absence of the gaseous species.

  13. A 492 GHz cooled Schottky receiver for radio-astronomy

    NASA Technical Reports Server (NTRS)

    Hernichel, J.; Schieder, R.; Stutzki, J.; Vowinkel, B.; Winnewisser, G.; Zimmermann, Peter

    1992-01-01

    We developed a 492 GHz cooled GaAs Schottky receiver driven by a solid state local oscillator with a DSB noise temperature of 550 K measured at the telescope. The receiver-bandwidth is approx. equal to 1.0 GHz. Quasi-optical mirrors focus the sky and local oscillator radiation into the mixer. Stability analysis via the Allan variance method shows that the total system including a 1 GHz bandwidth acousto-optical spectrometer built in Cologne allows integration times up to 100 sec per half switching cycle. We successfully used the receiver at the KOSMA 3 m telescope on Gornergrat (3150m) located in the central Swiss Alps near Zermatt during January-February 1992 for observations of the 492 GHz, (CI) (3)P1 to (3)P0 fine structure line in several galactic sources. These observations confirm that Gornergrat is an excellent winter submillimeter site in accordance with previous predictions based on the atmospheric opacity from KOSMA 345 GHz measurements.

  14. Localized corrosion of GaAs surfaces and formation of porous GaAs

    SciTech Connect

    Schmuki, P.; Vitus, C.M.; Isaacs, H.S.; Fraser, J.; Graham, M.J.

    1995-12-01

    The present work deals with pitting corrosion of p- and n-type GaAs (100). Pit growth can be electrochemically initiated on both conduction types in chloride-containing solutions and leads after extended periods of time to the formation of a porous GaAs structure. In the case of p-type material, localized corrosion is only observed if a passivating film is present on the surface, otherwise -- e.g. in acidic solutions -- the material suffers from a uniform attack (electropolishing) which is independent of the anion present. In contrast, pitting corrosion of n-type material can be triggered independent of the presence of an oxide film. This is explained in terms of the different current limiting factor for the differently doped materials (oxide film in the case of the p- and a space charge layer in the case of the n-GaAs). The porous structure was characterized by SEM, EDX and AES, and consists mainly of GaAs. From scratch experiments it is clear that the pit initiation process is strongly influenced by surface defects. For n-type material, AFM investigations show that light induced roughening of the order of several hundred nm occurs under non-passivating conditions. This nm- scale roughening however does not affect the pitting process.

  15. Structural, morphological, optical and electrical properties of Schottky diodes based on CBD deposited ZnO:Cu nanorods

    NASA Astrophysics Data System (ADS)

    Mwankemwa, Benard S.; Legodi, Matshisa J.; Mlambo, Mbuso; Nel, Jackie M.; Diale, Mmantsae

    2017-07-01

    Undoped and copper doped zinc oxide (ZnO) nanorods have been synthesized by a simple chemical bath deposition (CBD) method at a temperature of 90 °C. Structural, morphological, optical and electrical properties of the synthesized ZnO nanorods were found to be dependent on the Cu doping percentage. X-ray diffraction (XRD) patterns revealed strong diffraction peaks of hexagonal wurtzite of ZnO, and no impurity phases from metallic zinc or copper. Scanning electron microscopy (SEM) images showed changes in diameter and shape of nanorods, where by those doped with 2 at.% and 3 at.% aggregated and became compact. Selected area electron diffraction (SAED) patterns indicates high quality, single crystalline wurtzite structure ZnO and intensities of bright spots varied with copper doping concentration. UV-visible absorption peaks of ZnO red shifted with increasing copper doping concentration. Raman studies demonstrated among others, strong and sharp E2 (low) and E2 (high) optical phonon peaks confirming crystal structure of ZnO. Current-voltage measurements based on the gold/ZnO nanorods/ITO showed good rectifying behavior of the Schottky diode. The predicted Schottky barrier height of 0.60 eV was obtained which is not far from the theoretical Schottky-Mott value of 0.80 eV.

  16. Heterostructure design optimization for laser cooling of GaAs

    NASA Astrophysics Data System (ADS)

    Imangholi, B.; Wang, C.; Soto, E.; Sheik-Bahae, M.; Stintz, A.; Malloy, K.; Nuntawong, N.; Epstein, R.

    2007-02-01

    Doping of the clad layers in thin GaAs/GaInP heterostructures, displaces the band energy discontinuity, modifies the carrier concentration in the active GaAs region and changes the quality of the hetero-interfaces. As a result, internal and consequently external quantum efficiencies in the double heterostructure are affected. In this paper, the interfacial quality of GaAs/GaInP heterostructure is systematically investigated by adjusting the doping level and type (n or p) of the cladding layer. An optimum structure for laser cooling applications is proposed.

  17. Vertically grown Ge nanowire Schottky diodes on Si and Ge substrates

    NASA Astrophysics Data System (ADS)

    Chandra, Nishant; Tracy, Clarence J.; Cho, Jeong-Hyun; Picraux, S. T.; Hathwar, Raghuraj; Goodnick, Stephen M.

    2015-07-01

    The processing and performance of Schottky diodes formed from arrays of vertical Ge nanowires (NWs) grown on Ge and Si substrates are reported. The goal of this work is to investigate CMOS compatible processes for integrating NWs as components of vertically scaled integrated circuits, and elucidate transport in vertical Schottky NWs. Vertical phosphorus (P) doped Ge NWs were grown using vapor-liquid-solid epitaxy, and nickel (Ni)-Ge Schottky contacts were made to the tops of the NWs. Current-voltage (I-V) characteristics were measured for variable ranges of NW diameters and numbers of nanowires in the arrays, and the I-V characteristics were fit using modified thermionic emission theory to extract the barrier height and ideality factor. As grown NWs did not show rectifying behavior due to the presence of heavy P side-wall doping during growth, resulting in a tunnel contact. After sidewall etching using a dilute peroxide solution, rectifying behavior was obtained. Schottky barrier heights of 0.3-0.4 V and ideality factors close to 2 were extracted using thermionic emission theory, although the model does not give an accurate fit across the whole bias range. Attempts to account for enhanced side-wall conduction due to non-uniform P doping profile during growth through a simple shunt resistance improve the fit, but are still insufficient to provide a good fit. Full three-dimensional numerical modeling using Silvaco Atlas indicates that at least part of this effect is due to the presence of fixed charge and acceptor like traps on the NW surface, which leads to effectively high ideality factors.

  18. Thermally Stable Silver Nanowires-Embedding Metal Oxide for Schottky Junction Solar Cells.

    PubMed

    Kim, Hong-Sik; Patel, Malkeshkumar; Park, Hyeong-Ho; Ray, Abhijit; Jeong, Chaehwan; Kim, Joondong

    2016-04-06

    Thermally stable silver nanowires (AgNWs)-embedding metal oxide was applied for Schottky junction solar cells without an intentional doping process in Si. A large scale (100 mm(2)) Schottky solar cell showed a power conversion efficiency of 6.1% under standard illumination, and 8.3% under diffused illumination conditions which is the highest efficiency for AgNWs-involved Schottky junction Si solar cells. Indium-tin-oxide (ITO)-capped AgNWs showed excellent thermal stability with no deformation at 500 °C. The top ITO layer grew in a cylindrical shape along the AgNWs, forming a teardrop shape. The design of ITO/AgNWs/ITO layers is optically beneficial because the AgNWs generate plasmonic photons, due to the AgNWs. Electrical investigations were performed by Mott-Schottky and impedance spectroscopy to reveal the formation of a single space charge region at the interface between Si and AgNWs-embedding ITO layer. We propose a route to design the thermally stable AgNWs for photoelectric device applications with investigation of the optical and electrical aspects.

  19. Control of pn-junction turn-on voltage in 4H-SiC merged PiN Schottky diode

    NASA Astrophysics Data System (ADS)

    Park, Junbo; Park, Kun-Sik; Won, Jong-il; Kim, Ki-hwan; Koo, Sangmo; Kim, Sang-gi; Mun, Jae-Kyoung

    2017-04-01

    We present numerical simulation results and experimental measurements that explain the physical mechanism behind the high critical voltage, Vcrit, required to turn on a pn junction in a merged PiN Schottky (MPS) diode. The 2D simulation of potential distribution within a unit MPS cell demonstrated that the potential gradient set by the Schottky junction raises the potential barrier formed at the pn junction, thereby increasing Vcrit. Based on this knowledge, we propose that changing the ratio of the Schottky contact and the p+ region area, as well as shallow p-doping of the Schottky interface, can be used to control the magnitude of Vcrit. We present simulation and measurement results that demonstrate the feasibility of our approach.

  20. Ultrafast terahertz emission properties in GaAs semiconductor

    NASA Astrophysics Data System (ADS)

    Wang, Aihua; Shi, Yulei; Zhou, Qingli

    2015-08-01

    Ultrafast carrier dynamics in Schottky barriers is an extremely active area of research in recent years. The observation of the generation of terahertz pulses from metal/semiconductor interfaces provides a technique to characterize electronic properties of these materials. However, a detailed analysis of these phenomena has not been performed satisfactorily. In this work, the measurements of optically generated terahertz emission from Au/GaAs interfaces are investigated in detail. We observe that, under high laser power excitation, terahertz signals from bare GaAs wafers and Au/GaAs samples exhibit an opposite polarity. The polarity-flip behaviors in the terahertz beams are also observed in the temperature-dependent measurements and the femtosecond pump-generation studies of the Au/GaAs interfaces. These effects can be fully explained in terms of the dynamics of carrier transfer in the Au/GaAs Schottky barriers, which involves the internal photoelectric emission and the electron tunneling effect, and picosecond time constants are found for these processes.

  1. Reliability of Cascaded THz Frequency Chains with Planar GaAs Circuits

    NASA Technical Reports Server (NTRS)

    Maiwald, Frank; Schlecht, Erich; Lin, Robert; Ward, John; Pearson, John; Siegel, Peter; Mehdi, Imran

    2004-01-01

    Planar GaAs Schottky diodes will be utilized for all of the LO chains on the HIPI instrument for the Herschel Space Observatory. A better understanding of device degradation mechanisms is desirable in order to specify environmental and operational conditions that do not reduce device life times. Failures and degradation associated with ESD (Electrostatic Discharge), high temperatures, DC currents and RF induced current and heating have been investigated. The goal is to establish a procedure to obtain the safe operating range for a given frequency multiplier.

  2. GaAs solid state detectors for physics at the LHC

    SciTech Connect

    Beaumont, S.P. . Dept. of Electrical and Electronic Engineering); Bertin, R.; Zichichi, A. ); Booth, C.N.; Buttar, C.; Combley, F.H.; Dogru, M.; Hou, Y. . Dept. of Physics); Carraresi, L.; Colocci, M.; Francescato, A.; Nuti, M.; Peifer, P.G.; Tartoni, N.; Vanni, V.; Vinattieri, A. . Dipt. di Fisica INFN, Florence ); Cindolo, F.; Auria, S.D.; Papa, C. del; Fiori, F.; Lisowski, B.; O'Shea, V. . Dipt. of Fisica INFN, Bologna ); Edwards, M.; Seller, P.H.; Shankar, K.; Sharp, P.H. ); Nava, F.; Ottaviani, P. . Dipt. di Fiscia INFN, Modena ); Lynch, J.G.; Matheson, J.; Raine, C.; Skillicorn, I.O.; Smith, K.M.; Have, I. ten; Turbull, R.M. . Dept. of Physics and Astronomy); Foster, F.; Jones, B.; Santana,

    1993-08-01

    Progress with Schottky diode and p i n diode GaAs detectors for minimum ionizing particles is reported here. The radiation hardness and potential speed of simple diodes is shown to be more than competitive with silicon detectors. A discussion is given of the present understanding of the charge transport mechanism in the detectors as it influences their charge collection efficiency. Early results from micro-strip detectors are also described, (which are relevant for high radiation regions of LHC detectors near the beam pipe and in the forward region).

  3. Reliability of Cascaded THz Frequency Chains with Planar GaAs Circuits

    NASA Technical Reports Server (NTRS)

    Maiwald, Frank; Schlecht, Erich; Lin, Robert; Ward, John; Pearson, John; Siegel, Peter; Mehdi, Imran

    2004-01-01

    Planar GaAs Schottky diodes will be utilized for all of the LO chains on the HIPI instrument for the Herschel Space Observatory. A better understanding of device degradation mechanisms is desirable in order to specify environmental and operational conditions that do not reduce device life times. Failures and degradation associated with ESD (Electrostatic Discharge), high temperatures, DC currents and RF induced current and heating have been investigated. The goal is to establish a procedure to obtain the safe operating range for a given frequency multiplier.

  4. Quantum efficiency of the photocurrent in Schottky barrier structures

    NASA Astrophysics Data System (ADS)

    Simeonov, S. S.; Kafedzhiiska, E. I.; Gerasimov, A. L.

    1987-03-01

    Expressions for the concentration of minority and majority carriers in the illuminated space charge layer of Schottky barrier structures are obtained. The dark current and the photocurrent are determined from the minority and majority carrier concentration at the metal-semiconductor boundary of Schottky barrier structures. A correction to the Gartner expression for the quantum efficiency of the Schottky barrier structures is given. A qualitative estimation of a short-wavelength decrease in the quantum efficiency of Schottky barrier structures is proposed.

  5. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy.

    PubMed

    Ohno, Takeo; Oyama, Yutaka

    2012-02-01

    In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE), in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm(-2). They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor.

  6. Ohmic contacts to GaAs for high-temperature device applications

    NASA Technical Reports Server (NTRS)

    Anderson, W. T., Jr.; Christou, A.; Giuliani, J. F.; Dietrich, H. B.

    1981-01-01

    Ohmic contacts to n-type GaAs were developed for high temperature device applications up to 300 C. Refractory metallizations were used with epitaxial Ge layers to form the contacts: TiW/Ge/GaAs, Ta/Ge/GaAs, Mo/Ge/GaAs, and Ni/Ge/GaAs. Contacts with high dose Si or Se ion implantation of the Ge/GaAs interface were also investigated. The contacts were fabricated on epitaxial GaAs layer grown on N+ or semi-insulating GaAs substrates. Ohmic contact was formed by both thermal annealing (at temperatures up to 700 C) and laser annealing (pulsed Ruby). Examination of the Ge/GaAs interface revealed Ge migration into GaAs to form an N+ doping layer. The specific contact resistances of specimens annealed by both methods are given.

  7. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy

    PubMed Central

    Ohno, Takeo; Oyama, Yutaka

    2012-01-01

    In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE), in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm-2. They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor. PMID:27877466

  8. Identification of As/sub Ga/ antisites in plastically deformed GaAs

    SciTech Connect

    Weber, E.R.; Ennen, H.; Kaufmann, U.; Windscheif, J.; Schneider, J.; Wosinski, T.

    1982-09-01

    As/sub Ga/ antisite defects formed during plastic deformation of GaAs are identified by electron paramagnetic resonance (EPR) measurements. From photo-EPR results it can be concluded that the two levels of this double donor are located near E/sub c/ -0.75 eV and E/sub v/ +0.5 eV. These values are coincident with the Fermi level pinning energies at Schottky barriers. The upper level can be related to the ''main electron trap'' EL2 in GaAs. Photoluminescence experiments before and after thermal annealing suggest that As/sub Ga/ defects reduce the near band edge luminescence efficiency. A dislocation climb model is presented which is able to explain As/sub Ga/ formation during dislocation movement. The production of As/sub Ga/ antisites during dislocation motion under injection conditions in light emitting devices may thus be connected with degradation of the light output.

  9. Schottky Barrier Thin Film Transistor (SB-TFT) on low-temperature polycrystalline silicon

    NASA Astrophysics Data System (ADS)

    De Iacovo, A.; Ferrone, A.; Colace, L.; Minotti, A.; Maiolo, L.; Pecora, A.

    2016-12-01

    We report on the fabrication and characterization of Schottky barrier transistors on polycrystalline silicon. The transistors were realized exploiting Cr-Si and Ti-Si Schottky barrier with a low thermal budget process, compatible with polymeric, ultraflexible substrates. We obtained devices with threshold voltages as low as 1.7 V (for n channel) and 4 V (for p channel) with channel lengths ranging from 2 to 40 μm. Resulting on/off ratios are as high as 5 · 103. The devices showed threshold voltages and subthreshold slopes comparable with already published N- and P-MOS devices realized with the same process on polyimide substrates thus representing a cheaper and scalable alternative to ultraflexible transistors with doped source and drain.

  10. Schottky solar cells based on CsSnI3 thin-films

    NASA Astrophysics Data System (ADS)

    Chen, Zhuo; Wang, Jian J.; Ren, Yuhang; Yu, Chonglong; Shum, Kai

    2012-08-01

    We describe a Schottky solar cell based on the perovskite semiconductor CsSnI3 thin-film. The cell consists of a simple layer structure of indium-tin-oxide/CsSnI3/Au/Ti on glass substrate. The measured power conversion efficiency is 0.9%, which is limited by the series and shunt resistance. The influence of light intensity on open-circuit voltage and short-circuit current supports the Schottky solar cell model. Additionally, the spectrally resolved short-circuit current was measured, confirming the unintentionally doped CsSnI3 is of p-type characteristics. The CsSnI3 thin-film was synthesized by alternately depositing layers of SnCl2 and CsI on glass substrate followed by a thermal annealing process.

  11. Understanding Mott-Schottky Measurements under Illumination in Organic Bulk Heterojunction Solar Cells

    NASA Astrophysics Data System (ADS)

    Zonno, Irene; Martinez-Otero, Alberto; Hebig, Jan-Christoph; Kirchartz, Thomas

    2017-03-01

    The Mott-Schottky analysis in the dark is a frequently used method to determine the doping concentration of semiconductors from capacitance-voltage measurements, even for such complex systems as polymer:fullerene blends used for organic solar cells. While the analysis of capacitance-voltage measurements in the dark is relatively well established, the analysis of data taken under illumination is currently not fully understood. Here, we present experiments and simulations to show which physical mechanisms affect the Mott-Schottky analysis under illumination. We show that the mobility of the blend has a major influence on the shape of the capacitance-voltage curve and can be obtained from data taken under reverse bias. In addition, we show that the apparent shift of the built-in voltage observed previously can be explained by a shift of the onset of space-charge-limited collection with illumination intensity.

  12. Schottky contact on ultra-thin silicon nanomembranes under light illumination.

    PubMed

    Song, Enming; Si, Wenping; Cao, Ronggen; Feng, Ping; Mönch, Ingolf; Huang, Gaoshan; Di, Zengfeng; Schmidt, Oliver G; Mei, Yongfeng

    2014-12-05

    By repeating oxidation and subsequent wet chemical etching, we produced ultra-thin silicon nanomembranes down to 10 nm based on silicon-on-insulator structures in a controllable way. The electrical property of such silicon nanomembranes is highly influenced by their contacts with metal electrodes, in which Schottky barriers (SBs) can be tuned by light illumination due to the surface doping. Thermionic emission theory of carriers is applied to estimate the SB at the interface between metal electrodes and Si nanomembranes. Our work reveals that the Schottky contacts with Si nanomembranes can be influenced by external stimuli (like light luminescence or surface state) more heavily compared to those in the thicker ones, which implies that such ultra-thin-film devices could be of potential use in optical detectors.

  13. Characterization of deep electron traps in 4H-SiC Junction Barrier Schottky rectifiers

    NASA Astrophysics Data System (ADS)

    Gelczuk, Ł.; Dąbrowska-Szata, M.; Sochacki, M.; Szmidt, J.

    2014-04-01

    Conventional deep level transient spectroscopy (DLTS) technique was used to study deep electron traps in 4H-SiC Junction Barrier Schottky (JBS) rectifiers. 4H-SiC epitaxial layers, doped with nitrogen and grown on standard n+-4H-SiC substrates were exposed to low-dose aluminum ion implantation process under the Schottky contact in order to form both JBS grid and junction termination extension (JTE), and assure good rectifying properties of the diodes. Several deep electron traps were revealed and attributed to impurities or intrinsic defects in 4H-SiC epitaxial layers, on the basis of comparison of their electrical parameters (i.e. activation energies, apparent capture cross sections and concentrations) with previously published results.

  14. Tunable Schottky contacts in the antimonene/graphene van der Waals heterostructures

    NASA Astrophysics Data System (ADS)

    Li, Wei; Wang, Xinlian; Dai, Xianqi

    2017-03-01

    Electronic structures modulation in the antimonene/graphene van der Waals(vdW) heterostructure with an external electric field(Eext) are investigated by density functional theory calculations. It is demonstrated that weak vdW interactions dominate between antimonene and graphene with their intrinsic electronic properties preserved. Furthermore, the vertical Eext can control not only the Schottky barrier but also the Schottky contacts (n-type and p-type) and Ohmic contacts (n-type) at the antimonene/graphene interface. Meanwhile, the negative Eext can shifts the Dirac point of graphene above the Fermi level, resulting in p-type doping in graphene because electrons can easily transfer from the Dirac point of graphene to the conduction band of antimonene. The present study would open a new avenue for application of ultrathin antimonene/graphene heterostructures in future nano- and optoelectronics.

  15. A graphene barristor using nitrogen profile controlled ZnO Schottky contacts.

    PubMed

    Hwang, Hyeon Jun; Chang, Kyoung Eun; Yoo, Won Beom; Shim, Chang Hoo; Lee, Sang Kyung; Yang, Jin Ho; Kim, So-Young; Lee, Yongsu; Cho, Chunhum; Lee, Byoung Hun

    2017-02-16

    We have successfully demonstrated a graphene-ZnO:N Schottky barristor. The barrier height between graphene and ZnO:N could be modulated by a buried gate electrode in the range of 0.5-0.73 eV, and an on-off ratio of up to 10(7) was achieved. By using a nitrogen-doped ZnO film as a Schottky contact material, the stability problem of previously reported graphene barristors could be greatly alleviated and a facile route to build a top-down processed graphene barristor was realized with a very low heat cycle. This device will be instrumental when implementing logic functions in systems requiring high-performance logic devices fabricated with a low temperature fabrication process such as back-end integrated logic devices or flexible devices on soft substrates.

  16. Schottky barrier diode and method thereof

    NASA Technical Reports Server (NTRS)

    Aslam, Shahid (Inventor); Franz, David (Inventor)

    2008-01-01

    Pt/n.sup.-GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n.sup.-GaN Schottky barrier diodes have very large active areas, up to 1 cm.sup.2, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n.sup.-GaN Schottky diodes of sizes 0.25 cm.sup.2 and 1 cm.sup.2 have been fabricated from n.sup.-/n.sup.+ GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25 cm.sup.2 and 1 cm.sup.2 diodes both configured at a 0.5V reverse bias.

  17. Simulation and comparative study of tunneling field effect transistors with dopant-segregated Schottky source/drain

    NASA Astrophysics Data System (ADS)

    Zhang, Yi Bo; Sun, Lei; Xu, Hao; Han, Jing Wen

    2016-04-01

    Dopant-segregated Schottky source/drain tunneling field effect transistors (STFET) are investigated in this paper. The working mechanisms of STFET and the influence of device parameters are studied with Synopsys Sentaurus. Schottky source/drain MOSFETs possess several advantages over conventional MOSFETs, and dopant segregation can be feasibly achieved within current silicidation process. With dopant segregation, highly doped regions can be obtained after silicidation, which is necessary for band-to-band tunneling. With proper parameter setting, STFET can achieve comparable performance as TFET. High segregation doping for STFET is required to increase band-to-band tunneling probability and suppress bipolar behaviors. Increasing the electron barrier height at source side helps to provide larger drive current and higher on/off ratio. It is also found that STFET’s on-state performance is irrelevant to the segregation length when the segregation length is larger than a certain value. Furthermore, STFET is also insensitive to the Schottky barrier at drain side when the Schottky barrier at source side is fixed, which would relax the requirement for source/drain fabrication.

  18. Inadequacy of the Mott-Schottky equation in strongly pinned double Schottky barriers with no deep donors

    NASA Astrophysics Data System (ADS)

    Schipani, F.; Aldao, C. M.; Ponce, M. A.

    2012-12-01

    The capacitive behaviour of an intergranular double Schottky barrier in a polycrystalline semiconductor was evaluated. We found that the widely applied version of the Mott-Schottky equation can lead to significant errors. Even though we considered strong Fermi level pinning at the interface and no deep levels, the Mott-Schottky equation can be inadequate leading to huge errors due to voltage splitting at double Schottky barriers. Experiments carried out on ZnO varistors corroborated the main trends of our analysis.

  19. Experimental studies of the charge limit phenomenon in NEA GaAs photocathodes

    SciTech Connect

    Tang, H.; Alley, R.K.; Aoyagi, H.; Clendenin, J.E.; Frisch, J.C.; Mulhollan, G.A.; Saez, P.J.; Schultz, D.C.; Turner, J.L.

    1994-06-01

    Negative electron affinity GaAs photocathodes have been in continuous use at SLAC for generating polarized electron beams since early 1992. If the quantum efficiency of a GaAs cathode is below a critical value, the maximum photoemitted charge with photons of energies close to the band gap in a 2-ns pulse is found to be limited by the intrinsic properties of the cathode instead of by the space charge limit. We have studied this novel charge limit phenomenon in a variety of GaAs photocathodes of different structures and doping densities. We find that the charge limit is strongly dependent on the cathode`s quantum efficiency and the extraction electric field, and to a lesser degree on the excitation laser wavelength. In addition, we show that the temporal behavior of the charge limit depends critically on the doping density.

  20. The nature of electrical interaction of Schottky contacts

    SciTech Connect

    Torkhov, N. A.

    2011-08-15

    Electrical interaction between metal-semiconductor contacts combined in a diode matrix with a Schottky barrier manifests itself in an appreciable variation in their surface potentials and static current-volt-characteristics. The necessary condition for appearance of electrical interaction between such contacts consists in the presence of a peripheral electric field (a halo) around them; this field propagates to a fairly large distances (<30 {mu}m). The sufficient condition is the presence of regions where the above halos overlap. It has been shown that variation in the surface potential and the current-voltage characteristics of contacts occurs under the effect of the intrinsic electric field of the contact's periphery and also under the effect of an electric field at matrix periphery; the latter field is formed as a result of superposition of electric fields of halos which form its contacts. The degree of the corresponding effect is governed by the distance between contacts and by the total charge of the space charge regions for all contacts of the matrix: their number, sizes (diameter D{sub i,j}), concentration of doping impurities in the semiconductor N{sub D}, and physical nature of a metal-semiconductor system with a Schottky barrier (with the barrier height {phi}{sub b}). It is established that bringing the contacts closer leads to a relative decrease in the threshold value of the 'dead' zone in the forward current-voltage characteristics, an increase in the effective height of the barrier, and an insignificant increase in the nonideality factor. An increase in the total area of contacts (a total electric charge in the space charge region) in the matrix brings about an increase in the threshold value of the 'dead' zone, a relative decrease in the effective barrier height, and an insignificant increase in the ideality factor.

  1. Using Atom-Probe Tomography to Understand Zn O ∶Al /SiO 2/Si Schottky Diodes

    NASA Astrophysics Data System (ADS)

    Jaramillo, R.; Youssef, Amanda; Akey, Austin; Schoofs, Frank; Ramanathan, Shriram; Buonassisi, Tonio

    2016-09-01

    We use electronic transport and atom-probe tomography to study Zn O ∶Al /SiO 2/Si Schottky diodes on lightly doped n - and p -type Si. We vary the carrier concentration in the ZnO ∶Al films by 2 orders of magnitude, but the Schottky barrier height remains nearly constant. Atom-probe tomography shows that Al segregates to the interface, so that the ZnO ∶Al at the junction is likely to be metallic even when the bulk of the ZnO ∶Al film is semiconducting. We hypothesize that the observed Fermi-level pinning is connected to the insulator-metal transition in doped ZnO. This implies that tuning the band alignment at oxide/Si interfaces may be achieved by controlling the transition between localized and extended states in the oxide, thereby changing the orbital hybridization across the interface.

  2. Formation and properties of porous GaAs

    SciTech Connect

    Schmuki, P.; Lockwood, D.J.; Fraser, J.W.; Graham, M.J.; Isaacs, H.S.

    1996-06-01

    Porous structures on n-type GaAs (100) can be grown electrochemically in chloride-containing solutions. Crystallographic etching of the sample is a precursor stage of the attack. Polarization curves reveal the existanece of a critical onset potential for por formation (PFP). PFP is strongly dependent on the doping level of the sample and presence of surface defects. Good agreement between PFP and breakdown voltage of the space charge layer is found. Surface analysis by EDX, AES, and XPS show that the porous structure consists mainly of GaAs and that anion uptake in the structure can only observed after attackhas been initiated. Photoluminescence measurements reveal (under certain conditions) visible light emission from the porous structure.

  3. Stochastic Cooling with Schottky Band Overlap

    NASA Astrophysics Data System (ADS)

    Lebedev, Valeri

    2006-03-01

    Optimal use of stochastic cooling is essential to maximize the antiproton stacking rate for Tevatron Run II. Good understanding and characterization of the cooling is important for the optimization. The paper is devoted to derivation of the Fokker-Plank equations justified in the case of near or full Schottky base overlap for both longitudinal and transverse coolings.

  4. Stochastic Cooling with Schottky Band Overlap

    SciTech Connect

    Lebedev, Valeri; /Fermilab

    2005-12-01

    Optimal use of stochastic cooling is essential to maximize the antiproton stacking rate for Tevatron Run II. Good understanding and characterization of the cooling is important for the optimization. The paper is devoted to derivation of the Fokker-Planck equations justified in the case of near or full Schottky base overlap for both longitudinal and transverse coolings.

  5. Stochastic Cooling with Schottky Band Overlap

    SciTech Connect

    Lebedev, Valeri

    2006-03-20

    Optimal use of stochastic cooling is essential to maximize the antiproton stacking rate for Tevatron Run II. Good understanding and characterization of the cooling is important for the optimization. The paper is devoted to derivation of the Fokker-Plank equations justified in the case of near or full Schottky base overlap for both longitudinal and transverse coolings.

  6. An alternative methodology in Schottky diode physics

    NASA Astrophysics Data System (ADS)

    Mitra, J.; Feng, L.; Peñate-Quesada, L.; Dawson, P.

    2015-06-01

    The fabrication and electrical characterization of Schottky junction diodes have been extensively researched for three-quarters of a century since the original work of Schottky in 1938. This study breaks from the highly standardized regime of such research and provides an alternative methodology that prompts novel, more efficient applications of the adroit Schottky junction in areas such as chemical and thermal sensing. The core departure from standard Schottky diode configuration is that the metal electrode is of comparable or higher resistance than the underlying semiconductor. Further, complete electrical characterization is accomplished through recording four-probe resistance-temperature (RD-T) characteristics of the device, where electrical sourcing and sensing is done only via the metal electrode and not directly through the semiconductor. Importantly, this results in probing a nominally unbiased junction while eliminating the need for an Ohmic contact to the semiconductor. The characteristic RD-T plot shows two distinct regions of high (metal) and low (semiconductor) resistances at low and high temperatures, respectively, connected by a cross-over region of width, ΔT, within which there is a large negative temperature coefficient of resistance. The RD-T characteristic is highly sensitive to the Schottky barrier height; consequently, at a fixed temperature, RD responds appreciably to small changes in barrier height such as that induced by absorption of a chemical species (e.g., H2) at the interface. A theoretical model is developed to simulate the RD-T data and applied to Pd/p-Si and Pt/p-Si Schottky diodes with a range of metal electrode resistance. The analysis gives near-perfect fits to the experimental RD-T characteristics, yielding the junction properties as fit parameters. The modelling not only helps elucidate the underlying physics but also helps to comprehend the parameter space essential for the discussed applications. Although the primary regime

  7. High Efficiency and Wideband 300 GHz Frequency Doubler Based on Six Schottky Diodes

    NASA Astrophysics Data System (ADS)

    Ding, Jiangqiao; Maestrini, Alain; Gatilova, Lina; Cavanna, Antonella; Shi, Shengcai; Wu, Wen

    2017-07-01

    A high efficiency and wideband 300 GHz frequency doubler based on six Schottky diodes is presented in this paper. This balanced doubler features a compact and robust circuit on a 5-μm-thick, 0.36-mm-wide, and 1-mm-long GaAs membrane, fabricated by LERMA-C2N Schottky process. The conversion efficiency is mainly better than 16% across the wide bandwidth of 266-336 GHz (3 dB fractional bandwidth of 24%) when pumping with 20-60 mW input power (P in) at the room temperature. A peak output power of 14.75 mW at 332 GHz with a 61.18 mW P in, an excellent peak efficiency of 30.5% at 314 GHz with 43.86 mW P in and several frequency points with outstanding efficiency of higher than 25% are delivered. This doubler served as the second stage of the 600 GHz frequency multiplier chain is designed, fabricated, and measured. The performance of this 300 GHz doubler is highlighted comparing to the state-of-art terahertz frequency doublers.

  8. The Study of 0.34 THz Monolithically Integrated Fourth Subharmonic Mixer Using Planar Schottky Barrier Diode

    NASA Astrophysics Data System (ADS)

    Tong, Xiaodong; Li, Qian; An, Ning; Wang, Wenjie; Deng, Xiaodong; Zhang, Liang; Liu, Haitao; Zeng, Jianping; Li, Zhiqiang; Tang, Hailing; Xiong, Yong-Zhong

    2015-11-01

    A planar Schottky barrier diode with the designed Schottky contact area of approximately 3 μm2 is developed on gallium arsenide (GaAs) material. The measurements of the developed planar Schottky barrier diode indicate that the zero-biased junction capacitance Cj0 is 11.0 fF, the parasitic series resistance RS is 3.0 Ω, and the cut off frequency fT is 4.8 THz. A monolithically integrated fourth subharmonic mixer with this diode operating at the radio frequency (RF) signal frequency of 0.34 THz with the chip area of 0.6 mm2 is implemented. The intermediate frequency (IF) bandwidth is from DC to 40 GHz. The local oscillator (LO) bandwidth is 37 GHz from 60 to 97 GHz. The RF bandwidth is determined by the bandwidth of the on chip antenna, which is 28 GHz from 322 to 350 GHz. The measurements of the mixer demonstrated a conversion loss of approximately 51 dB.

  9. Enhanced Thermionic Emission and Low 1/f Noise in Exfoliated Graphene/GaN Schottky Barrier Diode.

    PubMed

    Kumar, Ashutosh; Kashid, Ranjit; Ghosh, Arindam; Kumar, Vikram; Singh, Rajendra

    2016-03-01

    Temperature-dependent electrical transport characteristics of exfoliated graphene/GaN Schottky diodes are investigated and compared with conventional Ni/GaN Schottky diodes. The ideality factor of graphene/GaN and Ni/GaN diodes are measured to be 1.33 and 1.51, respectively, which is suggestive of comparatively higher thermionic emission current in graphene/GaN diode. The barrier height values for graphene/GaN diode obtained using thermionic emission model and Richardson plots are found to be 0.60 and 0.72 eV, respectively, which are higher than predicted barrier height ∼0.40 eV as per the Schottky-Mott model. The higher barrier height is attributed to hole doping of graphene due to graphene-Au interaction which shifts the Fermi level in graphene by ∼0.3 eV. The magnitude of flicker noise of graphene/GaN Schottky diode increases up to 175 K followed by its decrease at higher temperatures. This indicates that diffusion currents and barrier inhomogeneities dominate the electronic transport at lower and higher temperatures, respectively. The exfoliated graphene/GaN diode is found to have lower level of barrier inhomogeneities than conventional Ni/GaN diode, as well as earlier reported graphene/GaN diode fabricated using chemical vapor deposited graphene. The lesser barrier inhomogeneities in graphene/GaN diode results in lower flicker noise by 2 orders of magnitude as compared to Ni/GaN diode. Enhanced thermionic emission current, lower level of inhomogeneities, and reduced flicker noise suggests that graphene-GaN Schottky diodes may have the underlying trend for replacing metal-GaN Schottky diodes.

  10. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method

    NASA Astrophysics Data System (ADS)

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C.

    2016-04-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.

  11. Growth and Photovoltaic Properties of High-Quality GaAs Nanowires Prepared by the Two-Source CVD Method.

    PubMed

    Wang, Ying; Yang, Zaixing; Wu, Xiaofeng; Han, Ning; Liu, Hanyu; Wang, Shuobo; Li, Jun; Tse, WaiMan; Yip, SenPo; Chen, Yunfa; Ho, Johnny C

    2016-12-01

    Growing high-quality and low-cost GaAs nanowires (NWs) as well as fabricating high-performance NW solar cells by facile means is an important development towards the cost-effective next-generation photovoltaics. In this work, highly crystalline, dense, and long GaAs NWs are successfully synthesized using a two-source method on non-crystalline SiO2 substrates by a simple solid-source chemical vapor deposition method. The high V/III ratio and precursor concentration enabled by this two-source configuration can significantly benefit the NW growth and suppress the crystal defect formation as compared with the conventional one-source system. Since less NW crystal defects would contribute fewer electrons being trapped by the surface oxides, the p-type conductivity is then greatly enhanced as revealed by the electrical characterization of fabricated NW devices. Furthermore, the individual single NW and high-density NW parallel arrays achieved by contact printing can be effectively fabricated into Schottky barrier solar cells simply by employing asymmetric Ni-Al contacts, along with an open circuit voltage of ~0.3 V. All these results indicate the technological promise of these high-quality two-source grown GaAs NWs, especially for the realization of facile Schottky solar cells utilizing the asymmetric Ni-Al contact.

  12. A 1.2 THz Planar Tripler Using GaAs Membrane Based Chips

    NASA Technical Reports Server (NTRS)

    Bruston, J.; Maestrini, A.; Pukala, D.; Martin, S.; Nakamura, B.; Mehdi, I.

    2001-01-01

    Fabrication technology for submillimeter-wave monolithic circuits has made tremendous progress in recent years and it is now possible to fabricate sub-micron GaAs Schottky devices on a number of substrate types, such as membranes, frame-less membranes or substrateless circuits. These new technologies allow designers to implement very high frequency circuits, either Schottky mixers or multipliers, in a radically new manner. This paper will address the design, fabrication, and preliminary results of a 1.2 THz planar tripler fabricated on a GaAs frame-less membrane, the concept of which was described previously. The tripler uses a diode pair in an antiparallel configuration similar to designs used at lower frequency. To date, this tripler has produced a peak output power of 80 microW with 0.9% efficiency at room temperature (at 1126 GHz). The measured fix-tuned 3 dB bandwidth is about 3.5%. When cooled, the output power reached a peak of 195 microW at 120 K and 250 microW at 50 K. The ease with which this circuit was implemented along with the superb achieved performance indicates that properly designed planar devices such as this tripler can now usher in a new era of practical very high frequency multipliers.

  13. Electrical analysis of low-energy argon-ion-bombarded GaAs

    SciTech Connect

    Cole, E.D.

    1988-01-01

    An electrical analysis was done on Al and Au Schottky diodes fabricated on n-type (100) GaAs which had been bombarded with low-energy Ar ions. The purpose of this study was to quantify electrically damage caused by the Ion Beam Etching (IBE) as functions of energy and fluence. Electrical studies included Deep Level Transient Spectroscopy (DLTS), Current-Voltage (I-V), Capacitance-Voltage (C-V), Conductance-Voltage (G-V), Capacitance-Temperature (C-T), and Activation Energy Analysis. These electrical measurements were carried out on GaAs exposed to a variety of treatments after IBE (such as chemical etch removal) to determine damage depth. At the lowest energy studied, 0.5 keV, Schottky reverse saturation currents increased by over 4 orders of magnitude from the virgin case. The ideality factor, n, increased slightly while the breakdown voltage decreased. The most prominent changes occurred in the DLTS spectrum where it was observed that the native arsenic defect EL2 peak disappeared completely after ion etching. Concurrently, a sharp increase in the diode conductivity with temperature was seen. Increasing ion-bombardment energy showed a steady degradation in diode ideality factors.

  14. GaAs Blocked-Impurity-Band Detectors for Far-Infrared Astronomy

    SciTech Connect

    Cardozo, Benjamin Lewin

    2004-01-01

    High-purity and doped GaAs films have been grown by Liquid-phase epitaxy (LPE) for development of a blocked impurity band (BIB) detector for far-infrared radiation. The film growth process developed has resulted in the capability to grow GaAs with a net active impurity concentration below 1 x 1013 cm-3, ideal for the blocking layer of the BIB detector. The growth of n-type LPE GaAs films with donor concentrations below the metal-insulator transition, as required for the absorbing layer of a BIB detector, has been achieved. The control of the donor concentration, however, was found to be insufficient for detector production. The growth by LPE of a high-purity film onto a commercially grown vapor-phase epitaxial (VPE) n-type GaAs doped absorbing layer resulted in a BIB device that showed a significant reduction in the low-temperature dark current compared to the absorbing layer only. Extended optical response was not detected, most likely due to the high compensation of the commercially grown GaAs absorbing layer, which restricts the depletion width of the device.

  15. Enhanced solar energy harvesting using top n-contact GaAs solar cell

    NASA Astrophysics Data System (ADS)

    Das, N. C.

    2015-05-01

    We fabricated single-junction solar cell on molecular beam epitaxially grown p-n junction on n-type gallium arsenide (GaAs) substrate. We used a germanium (Ge)/gold (Au)/nickel (Ni)/Au metal contact from the top side on a highly doped n+ epitaxial layer as well as the bottom side on an n-type GaAs substrate. We observed 10-15% increase in solar cell power when the top contact is used for the n+ GaAs epi layer compared to the bottom side n-type GaAs substrate. Solar cell fill factor, sheet, and shunt resistances are same for both the top and bottom contact type devices. We also observed higher external quantum efficiency (EQE) for top contact devices compared to bottom contact devices. We conclude that to achieve higher power, it is advantageous to use an n-type contact from a highly doped top n+ epitaxial layer rather than a bottom n-type GaAs substrate.

  16. Analysis of Heavy Ion Irradiation Induced Thermal Damage in SiC Schottky Diodes

    NASA Astrophysics Data System (ADS)

    Abbate, C.; Busatto, G.; Cova, P.; Delmonte, N.; Giuliani, F.; Iannuzzo, F.; Sanseverino, A.; Velardi, F.

    2015-02-01

    A study is presented aimed at describing phenomena involved in Single Event Burnout induced by heavy ion irradiation in SiC Schottky diodes. On the basis of experimental data obtained for 79Br irradiation at different energies, electro-thermal FEM is used to demonstrate that the failure is caused by a strong local increase of the semiconductor temperature. With respect to previous studies the temperature dependent thermal material properties were added. The critical ion energy calculated by this model is in agreement with literature experimental results. The substrate doping dependence of the SEE robustness was analyzed, proving the effectiveness of the developed model for device technological improvements.

  17. Metal-insulator transition in Au-NiO-Ni dual Schottky nanojunctions.

    PubMed

    Sun, Jia-Lin; Zhao, Xingchen; Zhu, Jia-Lin

    2009-11-11

    Ni nanowire arrays were fabricated through electrochemical deposition on a template. After a nanoscale NiO layer was formed on the top of the nanowires, a layer of Au paint was coated on the top of the nanowire arrays to construct Au-NiO-Ni dual Schottky nanojunctions, and the structure was characterized at different scales. Within a small range of voltages, extraordinary current jumps were observed at room temperature and at 77 K. The resistance switch effect can be repeated at room temperature, while switching is irreversible at low temperature. The significant change in resistance of the samples does not require doping and may find future applications.

  18. Controllable resistive switching in Au/Nb:SrTiO3 microscopic Schottky junctions

    NASA Astrophysics Data System (ADS)

    Wang, Yuhang; Shi, Xiaolan; Zhao, Kehan; Xie, Guanlin; Huang, Siyu; Zhang, Liuwan

    2016-02-01

    The reversible resistive switching effect at oxide interface shows promising applications in information storage and artificial intelligence. However, the microscopic switching mechanism is still elusive due to the difficulty of direct observation of the electrical and chemical behavior at the buried interface, which becomes a major barrier to design reliable, scalable, and reproducible devices. Here we used a gold-coated AFM tip as a removable electrode to investigate the resistive switching effect in a microscopic Au/Nb:SrTiO3 Schottky junction. We found that unlike the inhomogeneous random resistive switching in the macroscopic Schottky junctions, the high and low resistance states can be reversibly switched in a controllable way on the Nb-doped SrTiO3 surface by the conductive tip. The switching between the high and low resistance states in vacuum is accompanied by the reversible shift of the surface Fermi level. We indicate that the transfer of the interface oxygen ion in a double-well potential is responsible for the resistive switching in both macroscopic and microscopic Schottky junctions. Our findings provide a guide to optimize the key performance parameters of a resistive switching device such as operation voltage, switching speed, on/off ratio, and state retention time by proper electrode selection and fabrication strategy.

  19. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    SciTech Connect

    Malinowski, Pawel E.; Mertens, Robert; Van Hoof, Chris; Duboz, Jean-Yves; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Giordanengo, Boris; BenMoussa, Ali

    2011-04-04

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  20. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    NASA Astrophysics Data System (ADS)

    Malinowski, Pawel E.; Duboz, Jean-Yves; De Moor, Piet; Minoglou, Kyriaki; John, Joachim; Horcajo, Sara Martin; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Esposito, Marco; Giordanengo, Boris; BenMoussa, Ali; Mertens, Robert; Van Hoof, Chris

    2011-04-01

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  1. Differences in stability and repeatability between GaAs and GaAlAs photocathodes

    NASA Astrophysics Data System (ADS)

    Xu, Yuan; Zhang, Yijun; Feng, Cheng; Shi, Feng; Zou, Jijun; Chen, Xinlong; Chang, Benkang

    2016-12-01

    For the applications in vacuum photodetectors and photoinjectors, a crucial limiting factor for conventional GaAs photocathodes is the limited lifetime, depending on the Cs-O activation layer vulnerable to the harmful residual gases. In order to develop a type of GaAs-based photocathode with good stability and repeatability, Cs/O activation and multiple recesiation experiments under the same preparation condition were performed on reflection-mode exponential-doped GaAs and GaAlAs photocathodes grown by metalorganic vapor phase epitaxy, and quantum efficiency and photocurrent decay were measured after activation and recesiation. The experimental results show that the photoemission characteristics on cathode degradation and repeatability are different between GaAs and GaAlAs photocathodes. In an unsatisfactory vacuum system, the operational lifetime for GaAlAs photocathode is nearly twice longer than that for GaAs photocathode after Cs/O activation under a high intensity illumination. After multiple recesiations, the quantum efficiency and operational lifetime for GaAlAs photocathode remain nearly unchanged, while those for GaAs photocathode become lower and lower with the increase of recesiation cycles, which reflects the superiority in stability and repeatability for GaAlAs photocathode in contrast to GaAs photocathode operating in the poor vacuum environment.

  2. Fracture mechanics evaluation of GaAs

    NASA Technical Reports Server (NTRS)

    Chen, C. P.

    1984-01-01

    A data base of mechanical and fracture properties for GaAs was generated. The data for single crystal GaAs will be used to design reusable GaAs solar modules. Database information includes; (1) physical property characterizations; (2) fracture behavior evaluations; and (3) strength of cells determined as a function of cell processing and material parameters.

  3. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    NASA Astrophysics Data System (ADS)

    Harada, Yukihiro; Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi

    2014-01-01

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  4. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    SciTech Connect

    Harada, Yukihiro Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi

    2014-01-27

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  5. Control of GaAs Microwave Schottky Diode Electrical Characteristics by Contact Geometry: The Gap Diode.

    DTIC Science & Technology

    1982-05-01

    profile. After construction, the system was dismantled, the quartz and Pyrex parts cleaned thoroughly in aqua regia and rinsed in deionized water...field is reversed . In practice, the semiconductor can be made degenerate which results in an ohmic contact. 1.3.2.1 Alloying [10,11,12] A simple way to...relate the forward carrier flux Jf and reverse carrier flux Jr by if = Jr exp (a") (2.3) where ir =A* T2 exp ( ) (2.4) * Here, A is the Richardson

  6. Lifetime measurements by open circuit voltage decay in GaAs and InP diodes

    NASA Technical Reports Server (NTRS)

    Bhimnathwala, H. G.; Tyagi, S. D.; Bothra, S.; Ghandhi, S. K.; Borrego, J. M.

    1990-01-01

    Minority carrier lifetimes in the base of solar cells made on GaAs and InP were measured by the open-circuit voltage decay method. The measurement technique and the conditions under which the minority carrier lifetimes can be measured are described. Minority carrier lifetimes ranging from 1.6 to 34 ns in InP of different doping concentrations were measured. A minority carrier lifetime of 6 ns was measured in n-type GaAs, which agrees well with the lifetime of 5.7 ns measured by transient microwave reflection.

  7. Biexciton emission from single isoelectronic traps formed by nitrogen-nitrogen pairs in GaAs

    SciTech Connect

    Takamiya, Kengo; Fukushima, Toshiyuki; Yagi, Shuhei; Hijikata, Yasuto; Yaguchi, Hiroyuki; Mochizuki, Toshimitsu; Yoshita, Masahiro; Akiyama, Hidefumi; Kuboya, Shigeyuki; Onabe, Kentaro; Katayama, Ryuji

    2013-12-04

    We have studied photoluminescence (PL) from individual isoelectronic traps formed by nitrogen-nitrogen (NN) pairs in GaAs. Sharp emission lines due to exciton and biexciton were observed from individual isoelectronic traps in nitrogen atomic-layer doped (ALD) GaAs. The binding energy of biexciton bound to individual isoelectronic traps was approximately 8 meV. Both the exciton and biexciton luminescence lines show completely random polarization and no fine-structure splitting. These results are desirable to the application to the quantum cryptography used in the field of quantum information technology.

  8. Schottky diodes from 2D germanane

    NASA Astrophysics Data System (ADS)

    Sahoo, Nanda Gopal; Esteves, Richard J.; Punetha, Vinay Deep; Pestov, Dmitry; Arachchige, Indika U.; McLeskey, James T.

    2016-07-01

    We report on the fabrication and characterization of a Schottky diode made using 2D germanane (hydrogenated germanene). When compared to germanium, the 2D structure has higher electron mobility, an optimal band-gap, and exceptional stability making germanane an outstanding candidate for a variety of opto-electronic devices. One-atom-thick sheets of hydrogenated puckered germanium atoms have been synthesized from a CaGe2 framework via intercalation and characterized by XRD, Raman, and FTIR techniques. The material was then used to fabricate Schottky diodes by suspending the germanane in benzonitrile and drop-casting it onto interdigitated metal electrodes. The devices demonstrate significant rectifying behavior and the outstanding potential of this material.

  9. Schottky diodes from 2D germanane

    SciTech Connect

    Sahoo, Nanda Gopal; Punetha, Vinay Deep; Esteves, Richard J; Arachchige, Indika U.; Pestov, Dmitry; McLeskey, James T.

    2016-07-11

    We report on the fabrication and characterization of a Schottky diode made using 2D germanane (hydrogenated germanene). When compared to germanium, the 2D structure has higher electron mobility, an optimal band-gap, and exceptional stability making germanane an outstanding candidate for a variety of opto-electronic devices. One-atom-thick sheets of hydrogenated puckered germanium atoms have been synthesized from a CaGe{sub 2} framework via intercalation and characterized by XRD, Raman, and FTIR techniques. The material was then used to fabricate Schottky diodes by suspending the germanane in benzonitrile and drop-casting it onto interdigitated metal electrodes. The devices demonstrate significant rectifying behavior and the outstanding potential of this material.

  10. Nitride chemical passivation of a GaAs (100) Surface: Effect on the electrical characteristics of Au/GaAs surface-barrier structures

    SciTech Connect

    Berkovits, V. L. L'vova, T. V.; Ulin, V. P.

    2011-12-15

    The effect of chemical nitridation of GaAs substrates in a hydrazine-sulfide solution on the electrical characteristics of Au/GaAs Schottky structures has been studied. In nitridation of this kind, a solid passivating gallium nitride film with a monolayer thickness is formed on the surface of GaAs, providing almost direct contact between the semiconductor and the metal deposited on its surface. Au/GaAs structures fabricated on nitride substrates have ideality factors close to unity and are characterized by a narrow scatter of potential barrier heights. Prolonged heating of these structures at 350 Degree-Sign C does not change these parameters. The data obtained show that the nitride monolayer formed on the GaAs surface upon treatment in hydrazidesulfide solutions effectively hinders atomic migration across the metal-semiconductor phase boundary.

  11. GaAs Computer Technology

    DTIC Science & Technology

    1992-01-07

    AD-A259 259 FASTC-ID FOREIGN AEROSPACE SCIENCE AND TECHNOLOGY CENTER GaAs COMPUTER TECHNOLOGY (1) by Wang Qiao-yu 93-00999 Distrir bution t,,,Nm ted...FASTC- ID(RS)T-0310-92 HUMAN TRANSLATION FASTC-ID(RS)T-0310-92 7 January 1993 GaAs COMPUTER TECHNOLOGY (1) By: Wang Qiao-yu English pages: 6 Source...SCIENCE AND DO NOT NECESSARILY REFLECT THE POSITION OR TECHNOLOGY CENiER OPINION OF THE FOREIGN AEROSPACE SCIENCE AND WPAFB, OHIO TECHNOLOGY CENTER

  12. Plastic Schottky-barrier solar cells

    DOEpatents

    Waldrop, J.R.; Cohen, M.J.

    1981-12-30

    A photovoltaic cell structure is fabricated from an active medium including an undoped polyacetylene, organic semiconductor. When a film of such material is in rectifying contact with a metallic area electrode, a Schottky-barrier junction is obtained within the body of the cell structure. Also, a gold overlayer passivates a magnesium layer on the undoped polyacetylene film. With the proper selection and location of elements a photovoltaic cell structure and solar cell are obtained.

  13. Liquid junction schottky barrier solar cell

    DOEpatents

    Williams, Richard

    1980-01-01

    A mixture of ceric ions (Ce.sup.+4) and cerous ions (Ce.sup.+3) in an aqueous electrolyte solution forms a Schottky barrier at the interface between an active region of silicon and the electrolyte solution. The barrier height obtained for hydrogenated amorphous silicon using the Ce.sup.+4 /Ce.sup.+3 redox couple is about 1.7 eV.

  14. Schottky Barriers in Bilayer Phosphorene Transistors.

    PubMed

    Pan, Yuanyuan; Dan, Yang; Wang, Yangyang; Ye, Meng; Zhang, Han; Quhe, Ruge; Zhang, Xiuying; Li, Jingzhen; Guo, Wanlin; Yang, Li; Lu, Jing

    2017-04-12

    It is unreliable to evaluate the Schottky barrier height (SBH) in monolayer (ML) 2D material field effect transistors (FETs) with strongly interacted electrode from the work function approximation (WFA) because of existence of the Fermi-level pinning. Here, we report the first systematical study of bilayer (BL) phosphorene FETs in contact with a series of metals with a wide work function range (Al, Ag, Cu, Au, Cr, Ti, Ni, and Pd) by using both ab initio electronic band calculations and quantum transport simulation (QTS). Different from only one type of Schottky barrier (SB) identified in the ML phosphorene FETs, two types of SBs are identified in BL phosphorene FETs: the vertical SB between the metallized and the intact phosphorene layer, whose height is determined from the energy band analysis (EBA); the lateral SB between the metallized and the channel BL phosphorene, whose height is determined from the QTS. The vertical SBHs show a better consistency with the lateral SBHs of the ML phosphorene FETs from the QTS compared than that of the popular WFA. Therefore, we develop a better and more general method than the WFA to estimate the lateral SBHs of ML semiconductor transistors with strongly interacted electrodes based on the EBA for its BL counterpart. In terms of the QTS, n-type lateral Schottky contacts are formed between BL phosphorene and Cr, Al, and Cu electrodes with electron SBH of 0.27, 0.31, and 0.32 eV, respectively, while p-type lateral Schottky contacts are formed between BL phosphorene and Pd, Ti, Ni, Ag, and Au electrodes with hole SBH of 0.11, 0.18, 0.19, 0.20, and 0.21 eV, respectively. The theoretical polarity and SBHs are in good agreement with available experiments. Our study provides an insight into the BL phosphorene-metal interfaces that are crucial for designing the BL phosphorene device.

  15. Influence of arsenic flow on the crystal structure of epitaxial GaAs grown at low temperatures on GaAs (100) and (111) A substrates

    NASA Astrophysics Data System (ADS)

    Galiev, G. B.; Klimov, E. A.; Vasiliev, A. L.; Imamov, R. M.; Pushkarev, S. S.; Trunkin, I. N.; Maltsev, P. P.

    2017-01-01

    The influence of arsenic flow in a growth chamber on the crystal structure of GaAs grown by molecular-beam epitaxy at a temperature of 240°C on GaAs (100) and (111) A substrates has been investigated. The flow ratio γ of arsenic As4 and gallium was varied in the range from 16 to 50. GaAs films were either undoped, or homogeneously doped with silicon, or contained three equidistantly spaced silicon δ-layers. The structural quality of the annealed samples has been investigated by transmission electron microscopy. It is established for the first time that silicon δ-layers in "low-temperature" GaAs serve as formation centers of arsenic precipitates. Their average size, concentration, and spatial distribution are estimated. The dependence of the film structural quality on γ is analyzed. Regions 100-150 nm in size have been revealed in some samples and identified (by X-ray microanalysis) as pores. It is found that, in the entire range of γ under consideration, GaAs films on (111) A substrates have a poorer structural quality and become polycrystalline beginning with a thickness of 150-200 nm.

  16. Multipath-switching device utilizing a GaAs-based multiterminal nanowire junction with size-controlled dual Schottky wrap gates

    NASA Astrophysics Data System (ADS)

    Kasai, Seiya; Nakamura, Tatsuya; Shiratori, Yuta

    2007-05-01

    A multipath-switching device using a multiterminal nanowire junction with size-controlled dual gates is proposed and demonstrated experimentally. The device switches a number of output terminals according to multiple-valued input voltages for electrons entering from a root terminal. The switching function is implemented by dual gating on multiple nanowires with different threshold voltages Vth. Systematic Vth shift is made by changing gate lengths in nanometer scale. A triple-path-switching device is fabricated using AlGaAs /GaAs etched nanowires and nanometer-scale Schottky wrap gates. Its correct operation is confirmed at room temperature. Obtained results are explained by a simple analytical model.

  17. Multiple silicon nanowires-embedded Schottky solar cell

    NASA Astrophysics Data System (ADS)

    Kim, Joondong; Yun, Ju-Hyung; Han, Chang-Soo; Cho, Yong Jae; Park, Jeunghee; Park, Yun Chang

    2009-10-01

    Large area applicable silicon nanowire (SiNW)-embedded Schottky solar cell (SC) is fabricated. Multiple semiconducting SiNWs were positioned on two different metals. SiNW forms a Schottky or an Ohmic contact to each metal according to the Fermi level lineup. Electrons or holes have a barrier to transport resulting in a rectifying flow. Under 1 sun illumination, the SiNW Schottky SC provided 0.167 V of photovoltage and 91.91 nA of photocurrent with an ideality factor of 1.2. It discusses the fabrication scheme and mechanism of multiple SiNWs-embedded Schottky SC.

  18. Deforming super Riemann surfaces with gravitinos and super Schottky groups

    NASA Astrophysics Data System (ADS)

    Playle, Sam

    2016-12-01

    The (super) Schottky uniformization of compact (super) Riemann surfaces is briefly reviewed. Deformations of super Riemann surface by gravitinos and Beltrami parameters are recast in terms of super Schottky group cohomology. It is checked that the super Schottky group formula for the period matrix of a non-split surface matches its expression in terms of a gravitino and Beltrami parameter on a split surface. The relationship between (super) Schottky groups and the construction of surfaces by gluing pairs of punctures is discussed in an appendix.

  19. Effects of sputtering power Schottky metal layers on rectifying performance of Mo-SiC Schottky contacts

    NASA Astrophysics Data System (ADS)

    Lee, Seula; Lee, Jinseon; You, Sslimsearom; Kyoung, Sinsu; Kim, Kyung Hwan

    2016-01-01

    In this study, Schottky barrier diodes based on silicon carbide with various levels of Schottky metal layer input power were prepared and characterized. In this structure, molybdenum and aluminum were employed as the Schottky metal and top electrode, respectively. Schottky metal layers were deposited with input power ranging from 30 to 210 W. Schottky metal layers and top electrodes were deposited with a thickness of 3000 Å. The Schottky barrier heights, series resistances, and ideality factor were calculated from current-voltage (I-V) curves obtained using the Cheung-Cheung and Norde methods. All deposition processes were conducted using a facing targets sputtering system. Turn on voltage was minimized when the input power was 90 W, at which point electrical characteristics were observed to have properties superior to those at other levels of input power.

  20. Tuning of the Rashba effect in Pb quantum well states via a variable Schottky barrier

    PubMed Central

    Slomski, Bartosz; Landolt, Gabriel; Bihlmayer, Gustav; Osterwalder, Jürg; Dil, J. Hugo

    2013-01-01

    Spin-orbit interaction (SOI) in low-dimensional systems results in the fascinating property of spin-momentum locking. In a Rashba system the inversion symmetry normal to the plane of a two-dimensional (2D) electron gas is broken, generating a Fermi surface spin texture reminiscent of spin vortices of different radii which can be exploited in spin-based devices. Crucial for any application is the possibility to tune the momentum splitting through an external parameter. Here we show that in Pb quantum well states (QWS) the Rashba splitting depends on the Si substrate doping. Our results imply a doping dependence of the Schottky barrier which shifts the Si valence band relative to the QWS. A similar shift can be achieved by an external gate voltage or ultra-short laser pulses, opening up the possibility of terahertz spintronics. PMID:23752474

  1. Tuning of the Rashba effect in Pb quantum well states via a variable Schottky barrier.

    PubMed

    Slomski, Bartosz; Landolt, Gabriel; Bihlmayer, Gustav; Osterwalder, Jürg; Dil, J Hugo

    2013-01-01

    Spin-orbit interaction (SOI) in low-dimensional systems results in the fascinating property of spin-momentum locking. In a Rashba system the inversion symmetry normal to the plane of a two-dimensional (2D) electron gas is broken, generating a Fermi surface spin texture reminiscent of spin vortices of different radii which can be exploited in spin-based devices. Crucial for any application is the possibility to tune the momentum splitting through an external parameter. Here we show that in Pb quantum well states (QWS) the Rashba splitting depends on the Si substrate doping. Our results imply a doping dependence of the Schottky barrier which shifts the Si valence band relative to the QWS. A similar shift can be achieved by an external gate voltage or ultra-short laser pulses, opening up the possibility of terahertz spintronics.

  2. 1-kV vertical Ga2O3 field-plated Schottky barrier diodes

    NASA Astrophysics Data System (ADS)

    Konishi, Keita; Goto, Ken; Murakami, Hisashi; Kumagai, Yoshinao; Kuramata, Akito; Yamakoshi, Shigenobu; Higashiwaki, Masataka

    2017-03-01

    Ga2O3 field-plated Schottky barrier diodes (FP-SBDs) were fabricated on a Si-doped n--Ga2O3 drift layer grown by halide vapor phase epitaxy on a Sn-doped n+-Ga2O3 (001) substrate. The specific on-resistance of the Ga2O3 FP-SBD was estimated to be 5.1 mΩ.cm2. Successful field-plate engineering resulted in a high breakdown voltage of 1076 V. A larger-than-expected effective barrier height of 1.46 eV, which was extracted from the temperature-dependent current-voltage characteristics, could be caused by the effect of fluorine atoms delivered in a hydrofluoric acid solution process.

  3. Fabrication of Schottky Junction Between Au and SrTiO3

    NASA Astrophysics Data System (ADS)

    Inoue, Akira; Izumisawa, Kei; Uwe, Hiromoto

    2001-05-01

    A Schottky junction with a high rectification ratio between Au and La-doped SrTiO3 has been fabricated using a simple surface treatment. Highly La-doped (5%) SrTiO3 single crystals are annealed in O2 atmosphere at about 1000°C for 1 h and etched in HNO3 for more than five min. The HNO3 etching is performed in a globe box containing N2 to prevent pollution from the air. After the treatment, Au is deposited on the SrTiO3 surface in a vacuum (˜ 10-7 Torr) with an e-gun evaporator. The current voltage characteristics of the junction have shown excellent rectification properties, although junctions using neither annealed nor etched SrTiO3 exhibit high leak current in reverse voltage. The rectification ratio of the junction at 1 V is more than six orders of magnitude and there is no hysteresis in the current voltage spectra. The logarithm of the current is linear with the forward bias voltage. The ideal factor of the junction is estimated to be about 1.68. These results suggest that, if prevented from being pollution by the air, a good Schottky junction can be obtained by easy processes such as annealing in oxygen atmosphere and surface etching with acid.

  4. Comparison between ruthenium-based and other ohmic contact systems to p-type GaAs

    NASA Astrophysics Data System (ADS)

    Barnard, W. O.; Myburg, G.; Auret, F. D.

    1992-10-01

    A conventional furnace annealed Ru/Au ohmic contact system on p-GaAs has been investigated. Electrical and morphological characteristics of this contact system were compared with other systems such as Cr/Au, Ti/Pt, and Mn/Au. The Ru/Au contact system has been shown to have superior surface morphology and a comparable specific contact resistance value, even after annealing at 485 °C. The advantages of utilizing Ru as contact material to GaAs are that it forms high quality, thermally stable Schottky contacts to n-GaAs and thermally stable ohmic contacts with low specific contact resistance to p-GaAs. This dual nature of Ru contacts to GaAs makes them extremely important for future use in devices such as heterojunction bipolar transistors (HBTs) and solid state lasers.

  5. Low-temperature photoluminescence study of thin epitaxial GaAs films on Ge substrates

    NASA Astrophysics Data System (ADS)

    Brammertz, Guy; Mols, Yves; Degroote, Stefan; Motsnyi, Vasyl; Leys, Maarten; Borghs, Gustaaf; Caymax, Matty

    2006-05-01

    Thin epitaxial GaAs films, with thickness varying from 140 to 1000 nm and different Si doping levels, were grown at 650 °C by organometallic vapor phase epitaxy on Ge substrates and analyzed by low-temperature photoluminescence (PL) spectroscopy. All spectra of thin GaAs on Ge show two different structures, one narrow band-to-band (B2B) structure at an energy of ~1.5 eV and a broad inner-band-gap (IB) structure at an energy of ~1.1 eV. Small strain in the thin GaAs films causes the B2B structure to be separated into a light-hole and a heavy-hole peak. At 2.5 K the good structural quality of the thin GaAs films on Ge can be observed from the narrow excitonic peaks. Peak widths of less than 1 meV are measured. GaAs films with thickness smaller than 200 nm show B2B PL spectra with characteristics of an n-type doping level of approximately 1018 at./cm3. This is caused by heavy Ge diffusion from the substrate into the GaAs at the heterointerface between the two materials. The IB structure observed in all films consists of two Gaussian peaks with energies of 1.04 and 1.17 eV. These deep trapping states arise from Ge-based complexes formed within the GaAs at the Ge-GaAs heterointerface, due to strong diffusion of Ge atoms into the GaAs. Because of similarities with Si-based complexes, the peak at 1.04 eV was identified to be due to a GeGa-GeAs complex, whereas the peak at 1.17 eV was attributed to the GeGa-VGa complex. The intensity of the IB structure decreases strongly as the GaAs film thickness is increased. PL intensity of undoped GaAs films containing antiphase domains (APDs) is four orders of magnitude lower than for similar films without APDs. This reduction in intensity is due to the electrically active Ga-Ga and As-As bonds at the boundaries between the different APDs. When the Si doping level is increased, the PL intensity of the APD-containing films is increased again as well. A film containing APDs with a Si doping level of ~1018 at./cm3 has only a factor 10

  6. a Study of the Nature of the Schottky Barrier during Ultralow Coverage Stages of GALLIUM-ARSENIDE(110)/ALUMINUM and GALLIUM-ARSENIDE(110)/INDIUM Interface Formation.

    NASA Astrophysics Data System (ADS)

    Daniels, Robert Richard

    We present a study of the GaAs(110)/Al and GaAs(110)/In interface formation from submonolayer to bulk metallic coverages using synchrotron radiation photoemission spectroscopy. The experiments monitored changes in the surface and bulk core level binding energies and valence electronic state densities resulting from the deposition of aluminum or indium. These spectroscopic changes indicate the occurrence of specific chemical processes during the formation of the interface. This represents the first study of ultralow metal coverages (< 1/20 monolayer) on a semiconductor using this approach. Our results emphasize the critical importance of characterizing this regime in order to understand the metal-semiconductor interface. Extreme differences in the electronic properties are observed between these two interfaces and can be understood in terms of the different chemical processes. In particular, our results indicate the predominance of the aluminum or indium adatom-adatom bonding (cluster formation) over the metal-semiconductor bonding at the interface; we demonstrate that this is the key factor in determining such properties as the Schottky barrier height and coverage stabilization of the barrier. The relevance of current models of metal -semiconductor interfaces to GaAs(110)/Al and GaAs(110)/In is discussed in terms of metallic cluster formation. In particular, the influence of semiconductor surface defect states and metal induced gap states is examined.

  7. Schottky barrier height of Ni to β-(AlxGa1-x)2O3 with different compositions grown by plasma-assisted molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Ahmadi, Elaheh; Oshima, Yuichi; Wu, Feng; Speck, James S.

    2017-03-01

    Coherent β-(AlxGa1-x)2O3 films (x = 0, 0.038, 0.084, 0.164) were grown successfully on a Sn-doped β-Ga2O3 (010) substrate using plasma-assisted molecular beam epitaxy. Atom probe tomography, transmission electron microscopy, and high resolution x-ray diffraction were used to verify the alloy composition and high quality of the films. Schottky diodes were then fabricated using Ni as the Schottky metal. Capacitance-voltage measurements revealed a very low (<7 × 1015 cm-3) free charge density in the nominally undoped films. The barrier height and ideality factor were estimated by current-voltage (I-V) measurements performed at temperatures varying from 300 K to 500 K on the Schottky diodes. These measurements revealed that the apparent Schottky barrier height could have similar values for different compositions of β-(AlxGa1-x)2O3. We believe this is attributed to the lateral fluctuation in the alloy’s composition. This results in a lateral variation in the barrier height. Therefore, the average Schottky barrier height extracted from I-V measurements could be similar for β-(AlxGa1-x)2O3 films with different compositions.

  8. Transient Velocity Assessment in Gallium Arsenide, and of Other GaAs Characteristics Related to Device Functions

    DTIC Science & Technology

    2012-03-29

    GaAs, two-terminal devices such as N+N-N+ diodes, and three-terminal devices (such as MESFETs and bipolar transistors ) are treated. We have chosen...Cornell group is no longer working on the standard MESFET. Their planar-doped barrier transistor is a vertically oriented device that uses a barrier...made a few hundred angstroms thick. Figure 7 shows an energy diagram of the planar doped barrier transistor mentioned above. A second possibility

  9. Laterally stacked Schottky diodes for infrared sensor applications

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon (Inventor)

    1991-01-01

    Laterally stacked Schottky diodes for infrared sensor applications are fabricated utilizing porous silicon having pores. A Schottky metal contract is formed in the pores, such as by electroplating. The sensors may be integrated with silicon circuits on the same chip with a high quantum efficiency, which is ideal for IR focal plane array applications due to uniformity and reproducibility.

  10. Influence of SiCl sub 4 reactive ion etching on the electrical characteristics of GaAs

    SciTech Connect

    Lootens, D. , Laboratorium voor Elektromagnetisme en Acoustica , Sint-Pietersnieuwstraat 41, B-9000 Gent ); Clauws, P. ); Van Daele, P.; Demeester, P. , Laboratorium voor Elektromagnetisme en Acoustica , Sint-Pietersnieuwstraat 41, B-9000 Gent )

    1991-05-05

    SiCl{sub 4}-RIE causes electrical damage to GaAs strongly related to doping type and level. Changes in C-V and DLTS-measurements can be related to EL2-defects. Explanations for observed differences in n-type and p-type material will be presented.

  11. Gate Modulation of Graphene-ZnO Nanowire Schottky Diode.

    PubMed

    Liu, Ren; You, Xu-Chen; Fu, Xue-Wen; Lin, Fang; Meng, Jie; Yu, Da-Peng; Liao, Zhi-Min

    2015-05-06

    Graphene-semiconductor interface is important for the applications in electronic and optoelectronic devices. Here we report the modulation of the electric transport properties of graphene/ZnO nanowire Schottky diode by gate voltage (Vg). The ideality factor of the graphene/ZnO nanowire Schottky diode is ~1.7, and the Schottky barrier height is ~0.28 eV without external Vg. The Schottky barrier height is sensitive to Vg due to the variation of Fermi level of graphene. The barrier height increases quickly with sweeping Vg towards the negative value, while decreases slowly towards the positive Vg. Our results are helpful to understand the fundamental mechanism of the electric transport in graphene-semiconductor Schottky diode.

  12. Electrical and Optical Properties of Au-Catalyzed GaAs Nanowires Grown on Si (111) Substrate by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Wang, Chiu-Yen; Hong, Yu-Chen; Ko, Zong-Jie; Su, Ya-Wen; Huang, Jin-Hua

    2017-04-01

    In this study, defect-free zinc blende GaAs nanowires on Si (111) by molecular beam epitaxy (MBE) growth are systematically studied through Au-assisted vapor-liquid-solid (VLS) method. The morphology, density, and crystal structure of GaAs nanowires were investigated as a function of substrate temperature, growth time, and As/Ga flux ratio during MBE growth, as well as the thickness, annealing time, and annealing temperature of Au film using scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), cathodoluminescence (CL), and Raman spectroscopy. When the As/Ga flux ratio is fixed at 25 and the growth temperature at 540 °C, the GaAs nanowires exhibit a defect-free zinc blende structure with uniform and straight morphology. According to the characteristics of GaAs nanowires grown under varied conditions, a growth mechanism for defect-free zinc blende GaAs nanowires via Au-assisted vapor-liquid-solid (VLS) method is proposed. Finally, doping by Si and Be of nanowires is investigated. The results of doping lead to GaAs nanowires processing n-type and p-type semiconductor properties and reduced electrical resistivity. This study of defect-free zinc blende GaAs nanowire growth should be of assistance in further growth and applications studies of complex III-V group nanostructures.

  13. Spectroscopic constants and potential energy curves of GaAs, GaAs +, and GaAs -

    NASA Astrophysics Data System (ADS)

    Balasubramanian, K.

    1990-02-01

    Twenty electronic states of GaAs, 12 electronic states of GaAs +, and 13 electronic states of GaAs - are investigated using relativistic ab initio complete active space MCSCF (CASSCF) followed by large-scale configuration interaction calculations which included up to 700 000 configurations. Potential energy curves and spectroscopic constants of all these states of three radicals are obtained. Spectroscopic constants of low-lying states of GaAs are in very good agreement with both experiment and all-electron results. Two nearly-degenerate states of 2Σ +, 2Π ( 2Σ + lower) symmetries are found as candidates for the ground state of GaAs -. The GaAs - negative ion is found to be more stable compared to the neutral GaAs ( De(GaAs -) = 3 eV). The electron affinity of GaAs is computed as 0.89 and 1.3 eV at the FOCI and SOCI levels of theory, respectively. Calculated potential energy curves of GaAs are in accord with the experimentally observed predissociation in the 3Π( III) - X3Σ- system.

  14. Two-dimensional simulation for the GaAs V-groove gate MESFET's

    NASA Astrophysics Data System (ADS)

    Wang, Y. J.; Lu, S. S.

    1999-02-01

    V-groove gate MESFET's were investigated in this paper by 2D simulation. In these devices, an interesting drain-induced-carrier-accumulation (DICA) effect was found. This effect could explain the origin of the output conductance and the dependence of the pinch-off voltages on the drain bias (i.e. short-channel effect). An analytical formula with physical meaning parameters for describing the DICA effect were also proposed. In addition, different substrate effects (including the undoped GaAs, undoped Al 0.3Ga 0.7As and p-doped GaAs substrates) on the V-groove gate MESFET's were simulated. The simulated I- V characteristics of the three devices with the different substrates exhibited short channel effects but the mechanisms of the short channel effect were found different. In the device with undoped GaAs substrate, the mechanism of the short-channel effect was due to the leakage current in the substrate. However, in that with the undoped AlGaAs substrate, it was the DICA effect. As for the device with the p-doped GaAs substrate, both the leakage current and the DICA were found.

  15. ON-state characteristics of proton irradiated 4H-SiC Schottky diode: The calibration of model parameters for device simulation

    NASA Astrophysics Data System (ADS)

    Vobecký, J.; Hazdra, P.; Záhlava, V.; Mihaila, A.; Berthou, M.

    2014-04-01

    4H silicon carbide Schottky diodes were irradiated by 550 keV protons with the aim to place the ion range into the low-doped n-type epitaxial layer. The diodes were characterized using DLTS, C-V profiling and forward I-V curves. Calibration procedure of model parameters for device simulation has been carried out. It is based on modeling the doping compensation of the n-type epitaxial layer caused by the deep acceptor levels resulting from radiation damage. It is shown that the agreement of simulated and measured forward I-V curves of proton irradiated diodes can be achieved, if the profiles of deep levels are calibrated with respect to irradiation dose, the degradation of electron mobility due to charged deep levels is accounted of and the Schottky barrier height is properly adjusted. The proposed methodology introduces a starting point for exact calibration of ion irradiated SiC unipolar devices.

  16. Incorporation and thermal stability of defects in highly p-conductive non-stoichiometric GaAs : Be

    NASA Astrophysics Data System (ADS)

    Specht, P.; Cich, M. J.; Zhao, R.; Gebauer, J.; Luysberg, M.; Weber, E. R.

    2001-12-01

    Non-stoichiometric GaAs is known to contain a high concentration of native point defects. The dominant defect in the epilayers is the arsenic antisite (As Ga), a deep double donor, which is incorporated at low growth temperatures (commonly between 200°C and 300°C) in molecular beam epitaxy (MBE). Consequently, p-doping of non-stoichiometric GaAs is difficult because large concentrations of acceptors are compensated by the As Ga. Recently, we found that despite this compensation effect we can achieve p-conductive GaAs : Be with almost one order of magnitude higher Be-doping than previously obtained in MBE grown GaAs. The kinetics of dopant incorporation during MBE growth at these low growth temperatures seem to allow pushing the doping concentration further beyond thermal equilibrium. The epilayers, which are about 1 μm thick, are pseudomorphic with a lattice mismatch to the substrate of up to Δ c/ c=-0.4%. They remain free of structural defects such as dislocations and stacking faults. After annealing at 600 oC only the highest doped epilayers show a reduction in the Be concentration although the layers remain ultrahigh p-conductive. The increased incorporation of Be as well as its unusual stability in non-stoichiometric GaAs is likely influenced by the native defects in these layers, double positively charged As Ga defects and probably neutral gallium vacancies ( VGa). This novel material which is solely achievable through low-temperature growth may significantly enhance III-V semiconductor applicability due to ultrahigh doping capability with increased thermal stability.

  17. Fabrication and characterization of Au/p-ZnO Schottky contacts

    NASA Astrophysics Data System (ADS)

    Singh, Brijesh Kumar; Tripathi, Shweta

    2015-09-01

    This paper reports the electrical characteristics of gold contacts on p-type ZnO thin films synthesized by spin coating the sol containing zinc acetate and bismuth nitrate as main precursors. The structural, morphological and optical properties of the deposited thin film have been investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and Ellipsometry, respectively. Further, hot probe measurement has been used to ascertain the type of deposited film and it was observed that films doped with the concentration of 10 mol% Bi shows p-type nature that was found to be stable over the period of five months. Moreover, reflectance of the Bi doped ZnO with varying Bi concentrations, have also been calculated over the wavelength range of 300-800 nm. The optical band gap of Bi doped ZnO films have also been determined for different concentrations of Bi using the data taken by ellipsometer. The gold (Au) contacts have been deposited on the p-ZnO thin films using low cost thermal evaporation method. Electrical parameters such as the reverse saturation current, barrier height and ideality factor have also been determined for Au/p-ZnO thin film based Schottky contact using conventional thermionic emission model and Cheung's method. The conventional thermionic emission model yields barrier height ∼0.681 eV and ideality factor ∼2.3 however Cheung method gives barrier height ∼0.556 eV, ideality factor ∼2.186 and series resistance ∼923 Ω. The present study establishes the fact that Cheung's method can be the best and most realistic method for approximating the diode parameters including the effect of series resistance of the Au/p-ZnO Schottky diode under consideration.

  18. Deep level transient spectroscopy study of electron traps in n-type GaAs after pulsed electron beam irradiation

    SciTech Connect

    Marrakchi, G.; Barbier, D.; Guillot, G.; Nouailhat, A.

    1987-10-01

    Electrical and deep level transient spectroscopy measurements on Schottky barriers were performed in order to characterize electrically active defects in n-type GaAs (Bridgman substrates or liquid-phase epitaxial layers) after pulsed electron beam annealing. Both surface damage and bulk defects were observed in the Bridgman substrates depending on the pulse energy density. No electron traps were detected in the liquid-phase epitaxial layers before and after annealing for an energy density of 0.4 J/cm/sup 2/. The existence of an interfacial insulating layer at the metal-semiconductor interface, associated with As out-diffusion during the pulsed electron irradiation, was revealed by the abnormally high values of the Schottky barrier diffusion potential. Moreover, two new electron traps with activation energy of 0.35 and 0.43 eV, called EP1 and EP2, were introduced in the Bridgman substrates after pulsed electron beam annealing. The presence of these traps, related to the As evaporation, was tentatively attributed to the decrease of the EL2 electron trap signal after 0.4-J/cm/sup 2/ annealing. It is proposed that these new defects states are due to the decomposition of the As/sub Ga/-As/sub i/ complex recently considered as the most probable defect configuration for the dominant EL2 electron trap usually detected in as-grown GaAs substrates.

  19. Effects of various dopants on properties of GaAs tunneling junctions and p-i-n solar cells

    NASA Astrophysics Data System (ADS)

    Sodabanlu, Hassanet; Watanabe, Kentaroh; Sugiyama, Masakazu; Nakano, Yoshiaki

    2017-08-01

    Several GaAs tunneling junctions (TJs) and p-i-n single junction solar cells grown using a planetary metalorganic vapor phase epitaxy (MOVPE) reactor utilizing various dopant species including Zn, C, S, and Te were investigated. The incorporation of Te atoms into GaAs was approximately two orders larger than that of S atoms. Although only 30% of Te atoms could be electrically activated, a carrier concentration of 1019 cm-3 was achieved. Highly C-doped GaAs was successfully obtained by decreasing the growth temperature and increasing the amount of H2 carrier gas in order to prevent the predecomposition of CBr4 dopant gas. A hole concentration of about 1020 cm-3 was realized with a growth temperature of 450 °C. The C-Te-doped GaAs TJ exhibited the best ohmic tunneling behavior with a resistivity of 12.5 mΩ·cm2, while the others had diode characteristics. The GaAs solar cell grown with the Zn-S dopant showed the highest conversion efficiency ascribed to a longer minority carrier lifetime.

  20. Optical and magnetic properties of Mn{sup +}-implanted GaAs

    SciTech Connect

    Shon, Yoon; Park, Y.S.; Chung, K.J.; Fu, D.J.; Kim, D.Y.; Kim, H.S.; Kim, H.J.; Kang, T.W.; Kim, Yongmin; Fan, X.J.; Park, Y.J.

    2004-12-15

    Neutron-transmutation-doped GaAs samples were prepared by irradiating the middle-level neutrons into the semi-insulating GaAs grown by a liquid encapsulated Czochralski method and subsequently implanted with Mn{sup +}. The characteristics of the Mn{sup +}-implanted neutron-transmutation-doped GaAs (namely, the implantation of Mn{sup +} subsequent to neutron-transmutation-doping) were investigated by various measurements. The result of the energy dispersive x-ray peak displayed an injected Mn concentration of 9.65%. The photoluminescence peaks related to carbon and germanium acceptors were resolved, and the peaks related to Mn due to a neutral Mn acceptor were evidently observed. It is found that the proper activation for the neutral Mn acceptor starts from a relatively low annealing temperature of 600 deg. C for 15 min. The atomic force microscopy and magnetic forcemicroscopy images showed that magnetic clusters were well formed. The ferromagnetic hysteresis loop measured at 10 K was observed, and the temperature-dependent magnetization revealed that the two different phases exist at 135 and 360 K. The Curie temperature (T{sub c}{approx}360 K) is caused by MnAs, which agrees with the clusters of the magnetic force microscopy image.

  1. A strained silicon cold electron bolometer using Schottky contacts

    SciTech Connect

    Brien, T. L. R. Ade, P. A. R.; Barry, P. S.; Dunscombe, C.; Morozov, D. V.; Sudiwala, R. V.; Leadley, D. R.; Myronov, M.; Parker, E. H. C.; Prest, M. J.; Whall, T. E.; Prunnila, M.; Mauskopf, P. D.

    2014-07-28

    We describe optical characterisation of a strained silicon cold electron bolometer (CEB), operating on a 350 mK stage, designed for absorption of millimetre-wave radiation. The silicon cold electron bolometer utilises Schottky contacts between a superconductor and an n{sup ++} doped silicon island to detect changes in the temperature of the charge carriers in the silicon, due to variations in absorbed radiation. By using strained silicon as the absorber, we decrease the electron-phonon coupling in the device and increase the responsivity to incoming power. The strained silicon absorber is coupled to a planar aluminium twin-slot antenna designed to couple to 160 GHz and that serves as the superconducting contacts. From the measured optical responsivity and spectral response, we calculate a maximum optical efficiency of 50% for radiation coupled into the device by the planar antenna and an overall noise equivalent power, referred to absorbed optical power, of 1.1×10{sup −16} W Hz{sup −1/2} when the detector is observing a 300 K source through a 4 K throughput limiting aperture. Even though this optical system is not optimized, we measure a system noise equivalent temperature difference of 6 mK Hz{sup −1/2}. We measure the noise of the device using a cross-correlation of time stream data, measured simultaneously with two junction field-effect transistor amplifiers, with a base correlated noise level of 300 pV Hz{sup −1/2} and find that the total noise is consistent with a combination of photon noise, current shot noise, and electron-phonon thermal noise.

  2. Determination of carrier concentration and compensation microprofiles in GaAs

    NASA Technical Reports Server (NTRS)

    Jastrzebski, L.; Lagowski, J.; Walukiewicz, W.; Gatos, H. C.

    1980-01-01

    Simultaneous microprofiling of semiconductor free carrier, donor, and acceptor concentrations was achieved for the first time from the absolute value of the free carrier absorption coefficient and its wavelength dependence determined by IR absorption in a scanning mode. Employing Ge- and Si-doped melt-grown GaAs, striking differences were found between the variations of electron concentration and those of ionized impurity concentrations. These results showed clearly that the electronic characteristics of this material are controlled by amphoteric doping and deviations from stoichiometry rather than by impurity segregation.

  3. Identification of oxygen-related midgap level in GaAs

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Lin, D. G.; Gatos, H. C.; Aoyama, T.

    1984-01-01

    An oxygen-related deep level ELO was identified in GaAs employing Bridgman-grown crystals with controlled oxygen doping. The activation energy of ELO is almost the same as that of the dominant midgap level: EL2. This fact impedes the identification of ELO by standard deep level transient spectroscopy. However, it was found that the electron capture cross section of ELO is about four times greater than that of EL2. This characteristic served as the basis for the separation and quantitative investigation of ELO employing detailed capacitance transient measurements in conjunction with reference measurements on crystals grown without oxygen doping and containing only EL2.

  4. Schottky diode silicon liquid-crystal light valve

    NASA Astrophysics Data System (ADS)

    Sayyah, Keyvan; Efron, Uzi; Forber, Richard A.; Goodwin, Norman W.; Reif, Philip G.

    1991-06-01

    The authors report the operation of the Hughes Schottky diode-based silicon liquid crystal light valve (SLV) using readout light in the visible region. Limiting resolutions of 28 lp/mm limited by the Schottky diode periodicity, contrast ratios of >100:1, visible input light sensitivities of better than 50 (mu) W/cm2, and response times as fast as 5 ms have been measured. Both standard twisted nematic and homeotropically-aligned liquid crystal configurations have been utilized. The main parameter of this device is the leakage current of the Schottky diodes.

  5. Solution-Processed Germanium Nanowire-Positioned Schottky Solar Cells

    DTIC Science & Technology

    2011-04-01

    available soon. Solution-processed germanium nanowire-positioned Schottky solar cells Nanoscale Research Letters 2011, 6:287 doi:10.1186/1556-276X-6-287 Ju...DATES COVERED 00-00-2011 to 00-00-2011 4. TITLE AND SUBTITLE Solution-processed germanium nanowire-positioned Schottky solar cells 5a. CONTRACT...nanowire (GeNW)-positioned Schottky solar cell was fabricated by a solution process. A GeNW-containing solution was spread out onto asymmetric metal

  6. Comparison of degradation and recaesiation between GaAs and AlGaAs photocathodes in an unbaked vacuum system.

    PubMed

    Feng, Cheng; Zhang, Yijun; Shi, Feng; Qian, Yunsheng; Cheng, Hongchang; Zhang, Junju; Liu, Xinxin; Zhang, Xiang

    2017-03-20

    The lifetime and reliability of a photocathode during operation are always raised problems and the photocathode performance depends on the vacuum condition. With the purpose of investigating the stability and reliability of a GaAs-based photocathode in a harsher vacuum environment, reflection-mode exponential-doped GaAs and AlGaAs photocathodes are metalorganic vapor-phase epitaxial grown and then (Cs, O) activated inside an unbaked vacuum chamber. The degraded photocurrents are compared after activation and recaesiations between GaAs and AlGaAs photocathdoes under illumination with an equal initial photocurrent and an equal optical flux, respectively. It is found that the performance on degradation and recaesiations between GaAs and AlGaAs photocathodes are different. In the unbaked vacuum system, the stability of an AlGaAs photocathode after (Cs, O) activation is always better than that of a GaAs photocathode. After multiple recaesiations, the photocurrent decay curves of the AlGaAs photocathode are nearly coincident, which means a nearly constant operational lifetime. Moreover, operational lifetime of an AlGaAs photocathode is longer than that of a GaAs photocathode, which further illuminates that AlGaAs photocathodes are superior to GaAs photocathodes in stability and repeatability under markedly harsher vacuum conditions.

  7. Schottky barrier parameters and low frequency noise characteristics of graphene-germanium Schottky barrier diode

    NASA Astrophysics Data System (ADS)

    Khurelbaatar, Zagarzusem; Kil, Yeon-Ho; Shim, Kyu-Hwan; Cho, Hyunjin; Kim, Myung-Jong; Lee, Sung-Nam; Jeong, Jae-chan; Hong, Hyobong; Choi, Chel-Jong

    2016-03-01

    We investigated the electrical properties of chemical vapor deposition-grown monolayer graphene/n-type germanium (Ge) Schottky barrier diodes (SBD) using current-voltage (I-V) characteristics and low frequency noise measurements. The Schottky barrier parameters of graphene/n-type Ge SBDs, such as Schottky barrier height (VB), ideality factor (n), and series resistance (Rs), were extracted using the forward I-V and Cheung's methods. The VB and n extracted from the forward ln(I)-V plot were found to be 0.63 eV and 1.78, respectively. In contrast, from Cheung method, the VB and n were calculated to be 0.53 eV and 1.76, respectively. Such a discrepancy between the values of VB calculated from the forward I-V and Cheung's methods indicated a deviation from the ideal thermionic emission of graphene/n-type Ge SBD associated with the voltage drop across graphene. The low frequency noise measurements performed at the frequencies in the range of 10 Hz-1 kHz showed that the graphene/n-type Ge SBD had 1/f γ frequency dependence, with γ ranging from 1.09 to 1.12, regardless of applied forward biases. Similar to forward-biased SBDs operating in the thermionic emission mode, the current noise power spectral density of graphene/n-type Ge SBD was linearly proportional to the forward current.

  8. Detection of fast neutrons using detectors based on semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Zat'ko, B.; Sedlačková, K.; Dubecký, F.; Boháček, P.; Sekáčová, M.; Nečas, V.

    2011-12-01

    Detectors with AuZn square Schottky contact of the area of 2.5 × 2.5 mm2 were fabricated. On the back side, the whole area AuGeNi eutectic ohmic contact was evaporated. The thickness of the base material (semi-insulating GaAs) was 220 μm. The connection of 4 detectors in parallel was tested to get the detection area of 25 mm2. The 239Pu-Be fast neutron source with energies between 0.5 and 12 MeV was used in experimental measurements. We have investigated the optimal thickness of HDPE (high-density polyethylene) conversion layer for fast neutron detection. The spectra of the neutrons were measured by detectors covered by HDPE converter of different thicknesses. The fast neutron detection efficiency proved experimentally was compared with results from simulations performed by MCNPX (Monte Carlo N-Particle eXtended) code.

  9. GaAs MMIC phase shifters

    NASA Astrophysics Data System (ADS)

    Lane, A. A.; Myers, F. A.

    This paper describes the design and performance of various GaAs MMIC phase shifters specifically designed for electronically scanned antennas. Phase shifting is achieved by using GaAs FETs to switch various circuits to realize the required functions. Some preliminary results on novel components and high packing density techniques leading to truly effective multifunction circuits are described.

  10. Characterization of vertical Au/β-Ga2O3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

    NASA Astrophysics Data System (ADS)

    X, Z. Liu; C, Yue; C, T. Xia; W, L. Zhang

    2016-01-01

    High-resistivity β-Ga2O3 thin films were grown on Si-doped n-type conductive β-Ga2O3 single crystals by molecular beam epitaxy (MBE). Vertical-type Schottky diodes were fabricated, and the electrical properties of the Schottky diodes were studied in this letter. The ideality factor and the series resistance of the Schottky diodes were estimated to be about 1.4 and 4.6× 106 Ω. The ionized donor concentration and the spreading voltage in the Schottky diodes region are about 4 × 1018 cm-3 and 7.6 V, respectively. The ultra-violet (UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination. A photoresponsivity of 1.8 A/W and an external quantum efficiency of 8.7 × 102% were observed at forward bias voltage of 3.8 V, the proper driving voltage of read-out integrated circuit for UV camera. The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga2O3 thin films and the n-type conductive β-Ga2O3 single-crystal substrate. Project supported by the National Nature Science Foundation of China (Grant No. 61223002) the Science and Technology Commission of Shanghai Municipality, China (Grant No. 13111103700), and the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 2012018530003).

  11. Pt/ZnO nanowire Schottky diodes

    SciTech Connect

    Heo, Y.W.; Tien, L.C.; Norton, D.P.; Pearton, S.J.; Kang, B.S.; Ren, F.; LaRoche, J.R.

    2004-10-11

    Pt Schottky diodes were formed on single ZnO nanowires grown by site-selective molecular-beam epitaxy and then transferred to SiO{sub 2}-coated Si substrates. The diodes exhibit excellent ideality factors of 1.1 at 25 deg. C and very low (1.5x10{sup -10} A, equivalent to 2.35 A cm{sup -2}, at -10 V) reverse currents. The nanowire diodes show a strong photoresponse, with the current-voltage characteristics becoming ohmic under ultraviolet illumination (366 nm light). The on-off current ratio of the diodes at 0.15/-5 V was {approx}6. These results show the ability to manipulate the electron transport in nanoscale ZnO devices.

  12. GaAs solar cell development

    NASA Technical Reports Server (NTRS)

    Knechtli, R. C.; Kamath, S.; Loo, R.

    1977-01-01

    The motivation for developing GaAs solar cells is based on their superior efficiency when compared to silicon cells, their lower degradation with increasing temperature, and the expectation for better resistance to space radiation damage. The AMO efficiency of GaAs solar cells was calculated. A key consideration in the HRL technology is the production of GaAs cells of large area (greater than 4 sg cm) at a reasonable cost without sacrificing efficiency. An essential requirement for the successful fabrication of such cells is the ability to grow epitaxially a uniform layer of high quality GaAs (buffer layer) on state-of-the-art GaAs substrates, and to grow on this buffer layer the required than layer of (AlGa)As. A modified infinite melt liquid phase epitaxy (LPE) growth technique is detailed.

  13. Two-dimensional ferromagnet/semiconductor transition metal dichalcogenide contacts: p-type Schottky barrier and spin-injection control

    NASA Astrophysics Data System (ADS)

    Gan, Li-Yong; Zhang, Qingyun; Cheng, Yingchun; Schwingenschlögl, Udo

    2013-12-01

    We study the ferromagnet/semiconductor contacts formed by transition metal dichalcogenide monolayers, focusing on semiconducting MoS2 and WS2 and ferromagnetic VS2. We investigate the degree of p-type doping and demonstrate tuning of the Schottky barrier height by vertical compressive pressure. An analytical model is presented for the barrier heights that accurately describes the numerical findings and is expected to be of general validity for all transition metal dichalcogenide metal/semiconductor contacts. Furthermore, magnetic proximity effects induce a 100% spin polarization at the Fermi level in the semiconductor where the spin splitting increases up to 0.70 eV for increasing pressure.

  14. Correlation of EBIC and SWBXT Imaged Defects and Epilayer Growth Pits in 6H-SiC Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Schnable, C. M.; Tabib-Azar, M.; Neudeck, P. G.; Bailey, S. G.; Su, H. B.; Dudley, M.; Raffaelle, R. P.

    2000-01-01

    We show the first direct experimental correlation between the presence of closed core screw dislocations in 6H-SiC epilayers with recombination centers, as well as with some of the small growth pits on the epilayer surface in lightly-doped 6H-SiC Schottky diodes. At every Synchrotron White-Beam X-ray Topography (SWBXT)-identified closed core screw dislocation, an Electron Beam Induced Current (EBIC) image showed a dark spot indicating a recombination center, and Nomarski optical microscope and Atomic Force Microscope (AFM) images showed a corresponding small growth pit with a sharp apex on the surface of the epilayer.

  15. PtSi/Si LWIR Detectors Made With p+ Doping Spikes

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon; Park, Jin S.; George, Thomas; Fathauer, Robert W.; Jones, Eric W.; Maserjian, Joseph

    1996-01-01

    PtSi/Si Schottky-barrier devices detecting long-wavelength infrared (LWIR) photons demonstrated. Essential feature of one of these devices is p+ "doping spike"; layer of Si about 10 Angstrom thick, located at PtSi/Si interface, and doped with electron acceptors (boron atoms) at concentration between 5 x 10(19) and 2 x 10(20) cm(-3). Doping spikes extend cutoff wavelengths of devices to greater values than otherwise possible.

  16. PtSi/Si LWIR Detectors Made With p+ Doping Spikes

    NASA Technical Reports Server (NTRS)

    Lin, True-Lon; Park, Jin S.; George, Thomas; Fathauer, Robert W.; Jones, Eric W.; Maserjian, Joseph

    1996-01-01

    PtSi/Si Schottky-barrier devices detecting long-wavelength infrared (LWIR) photons demonstrated. Essential feature of one of these devices is p+ "doping spike"; layer of Si about 10 Angstrom thick, located at PtSi/Si interface, and doped with electron acceptors (boron atoms) at concentration between 5 x 10(19) and 2 x 10(20) cm(-3). Doping spikes extend cutoff wavelengths of devices to greater values than otherwise possible.

  17. Growth and characterization of Czochralski-grown n and p-type GaAs for space solar cell substrates

    NASA Technical Reports Server (NTRS)

    Chen, R. T.

    1983-01-01

    Progress in LEC (liquid encapsulated Czochralski) crystal growth techniques for producing high-quality, 3-inch-diameter, n- and p-type GaAs crystals suitable for solar cell applications is described. The LEC crystals with low dislocation densities and background impurities, high electrical mobilities, good dopant uniformity, and long diffusion lengths were reproducibly grown through control of the material synthesis, growth and doping conditions. The capability for producing these large-area, high-quality substrates should positively impact the manufacturability of highly efficiency, low cost, radiation-hard GaAs solar cells.

  18. A novel double gate metal source/drain Schottky MOSFET as an inverter

    NASA Astrophysics Data System (ADS)

    Loan, Sajad A.; Kumar, Sunil; Alamoud, Abdulrahman M.

    2016-03-01

    In this work, we propose and simulate a novel structure of a double gate metal source/drain (MSD) Schottky MOSFET. The novelty of the proposed device is that it realizes a complete CMOS inverter action, which is actually being realized by the combination of two n and p type MOS transistors in the conventional CMOS technology. Therefore, the use of this device will significantly reduce the transistor count in implementing combinational and sequential circuits. Further, there is a significant reduction in the number of junctions and regions in the proposed device in comparison to the conventional CMOS inverter. Therefore, the proposed device is compact and can consume less power. The proposed device has been named as Sajad-Sunil-Schottky (SSS) device. The mixed mode circuit analysis of the proposed SSS device has shown that a CMOS inverter action with high logic level (VOH) and low logic level (VOL) as ∼VDD and ∼ground respectively. A two dimensional calibrated simulation study using the experimental data has revealed that the proposed SSS device in n and p type modes have subthreshold slopes (S) of 130 mV/decade and 85 mV/decade respectively and have reasonable high ION and ION/IOFF ratio's. Furthermore, it has been proved that such a device action cannot be realised by folding the conventional doped n and p MOS transistors.

  19. Chip-integrated plasmonic Schottky photodetection based on hybrid silicon waveguides

    NASA Astrophysics Data System (ADS)

    Lu, Hua; Gu, Min

    2017-03-01

    We numerically and theoretically investigate the plasmonic Schottky photodetection in a novel hybrid silicon-on-insulator waveguide system, which consists of the silicon waveguides and detection area with the metal stripes and doped silicon film on the silicon dioxide substrate. The results illustrate that the fundamental TE mode in the silicon waveguide can be effectively coupled into the metal/silicon waveguide with the excitation of surface plasmon polaritons (SPPs). The coupling is suppressed for the TM mode due to the mismatch between the electric field distributions of the TM and SPP modes. It is found that the coupling efficiency from the TE to SPP mode is dependent on the width and height of the silicon waveguide and can significantly approach 36.1%. The ultracompact configuration yields a high responsivity of 21.7 mA/W and low dark current of 0.45 μA for the photodetection at the communication wavelength. The plasmonic Schottky photodetector could find favorable applications in the chip-integrated optical interconnects and signal processing.

  20. Modeling of 4H—SiC multi-floating-junction Schottky barrier diode

    NASA Astrophysics Data System (ADS)

    Pu, Hong-Bin; Cao, Lin; Chen, Zhi-Ming; Ren, Jie; Nan, Ya-Gong

    2010-10-01

    This paper develops a new and easy to implement analytical model for the specific on-resistance and electric field distribution along the critical path for 4H—SiC multi-floating junction Schottky barrier diode. Considering the charge compensation effects by the multilayer of buried opposite doped regions, it improves the breakdown voltage a lot in comparison with conventional one with the same on-resistance. The forward resistance of the floating junction Schottky barrier diode consists of several components and the electric field can be understood with superposition concept, both are consistent with MEDICI simulation results. Moreover, device parameters are optimized and the analyses show that in comparison with one layer floating junction, multilayer of floating junction layer is an effective way to increase the device performance when specific resistance and the breakdown voltage are traded off. The results show that the specific resistance increases 3.2 mΩ·cm2 and breakdown voltage increases 422 V with an additional floating junction for the given structure.

  1. New type of Schottky diode-based Cu-Al-Mn-Cr shape memory material films

    NASA Astrophysics Data System (ADS)

    Aksu Canbay, C.; Dere, A.; Mensah-Darkwa, Kwadwo; Al-Ghamdi, Ahmed; Karagoz Genç, Z.; Gupta, R. K.; Yakuphanoglu, F.

    2016-07-01

    Cr-doped CuAlMn shape memory alloys were produced by arc melting method. The effects of Cr content on microstructure and transformation parameters of were investigated. The alloys were characterized by X-ray analysis, optical microscope observations and differential scanning calorimetry measurements. The grain size of the alloys was decreased by the addition of Cr into CuAlMn alloy system. The martensite transformation temperature was shifted both the lower temperature and higher temperature with the addition of chromium. This change was explained on the basis of the change in the thermodynamics such as enthalpy, entropy and activation energy values. The obtained results indicate that the phase transformation temperatures of the CuAlMn alloy system can be controlled by addition of Cr. We fabricated a Schottky barrier diode and observed that ideality factor and barrier height increase with increasing temperature. The diodes exhibited a thermal sensor behavior. This indicates that Schottky diode-based Cu-Al-Mn-Cr shape memory material films can be used as a sensor in high-temperature measurement applications.

  2. Effect of Post Deposition Annealing Treatments on Properties of AZO Thin Films for Schottky Diode Applications.

    PubMed

    Singh, Shaivalini; Park, Si-Hyun

    2016-01-01

    High-quality aluminum (Al) doped ZnO (AZO) thin films were deposited on silicon substrates by RF sputtering at room temperature. The deposited films were annealed from the temperatures 350 °C to 650 °C in pure nitrogen (N₂) ambient. The effects of annealing on the microstructural, optical and electrical properties of the AZO films were investigated. A detailed analysis by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Four Probe and Hall measurements was performed to study the properties of these AZO thin films. It was observed that all of the as-deposited and annealed AZO films have homogenous surfaces and hexagonal wurtzite structures with good crystalline quality. The study also suggested that there was an intermediate post annealing temperature (450 °C) at which the deposited ZnO film exhibit best surface characteristics. Pd/AZO Schottky devices were fabricated with 450 °C annealed AZO thin films and the parameters of Schottky devices were extracted from I-V characteristics. These results indicated that the Pd/AZO films were very much suitable for various optoelectronics applications particularly for metal semiconductor metal based UV detector application.

  3. Hot carrier multiplication on graphene/TiO2 Schottky nanodiodes

    PubMed Central

    Lee, Young Keun; Choi, Hongkyw; Lee, Hyunsoo; Lee, Changhwan; Choi, Jin Sik; Choi, Choon-Gi; Hwang, Euyheon; Park, Jeong Young

    2016-01-01

    Carrier multiplication (i.e. generation of multiple electron–hole pairs from a single high-energy electron, CM) in graphene has been extensively studied both theoretically and experimentally, but direct application of hot carrier multiplication in graphene has not been reported. Here, taking advantage of efficient CM in graphene, we fabricated graphene/TiO2 Schottky nanodiodes and found CM-driven enhancement of quantum efficiency. The unusual photocurrent behavior was observed and directly compared with Fowler’s law for photoemission on metals. The Fowler’s law exponent for the graphene-based nanodiode is almost twice that of a thin gold film based diode; the graphene-based nanodiode also has a weak dependence on light intensity—both are significant evidence for CM in graphene. Furthermore, doping in graphene significantly modifies the quantum efficiency by changing the Schottky barrier. The CM phenomenon observed on the graphene/TiO2 nanodiodes can lead to intriguing applications of viable graphene-based light harvesting. PMID:27271245

  4. Hot carrier multiplication on graphene/TiO2 Schottky nanodiodes

    NASA Astrophysics Data System (ADS)

    Lee, Young Keun; Choi, Hongkyw; Lee, Hyunsoo; Lee, Changhwan; Choi, Jin Sik; Choi, Choon-Gi; Hwang, Euyheon; Park, Jeong Young

    2016-06-01

    Carrier multiplication (i.e. generation of multiple electron–hole pairs from a single high-energy electron, CM) in graphene has been extensively studied both theoretically and experimentally, but direct application of hot carrier multiplication in graphene has not been reported. Here, taking advantage of efficient CM in graphene, we fabricated graphene/TiO2 Schottky nanodiodes and found CM-driven enhancement of quantum efficiency. The unusual photocurrent behavior was observed and directly compared with Fowler’s law for photoemission on metals. The Fowler’s law exponent for the graphene-based nanodiode is almost twice that of a thin gold film based diode; the graphene-based nanodiode also has a weak dependence on light intensity—both are significant evidence for CM in graphene. Furthermore, doping in graphene significantly modifies the quantum efficiency by changing the Schottky barrier. The CM phenomenon observed on the graphene/TiO2 nanodiodes can lead to intriguing applications of viable graphene-based light harvesting.

  5. GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Conway, E. J.

    1982-01-01

    The major thrusts proposed for GaAs were increased efficiency and improved radiation damage data. Current laboratory production cells consistently achieve 16 percent AMO one-Sun efficiency. The user community wants 18-percent efficient cells as soon as possible, and such a goal is though to be achievable in 2 years with sufficient research funds. A 20-percent research cell is considered the efficiency limit with current technology, and such a cell seems realizable in approximately 4 years. Future efficiency improvements await improved substrates and materials. For still higher efficiencies, concentrator cells and multijunction cells are proposed as near-term directions.

  6. Effect of radiation-induced emission of Schottky defects on the formation of colloids in alkali halides

    NASA Astrophysics Data System (ADS)

    Dubinko, V. I.; Vainshtein, D. I.; den Hartog, H. W.

    2003-10-01

    Formation of vacancy clusters in irradiated crystals is considered taking into account radiation-induced Schottky defect emission (RSDE) from extended defects. RSDE acts in the opposite direction compared with Frenkel pair production, and it results in the radiation-induced recovery processes. In the case of alkali halides, Schottky defects can be produced as a result of the interaction of extended defects with excitons , as has been suggested by Seitz in 1954. We consider a model that takes into account excitonic mechanisms for the creation of both Frenkel and Schottky defects, and which shows that although the contribution of the latter mechanism to the production of primary defects may be small, its role in the radiation-induced evolution of microstructure can be very significant. The model is applied to describe the evolution of sodium colloids and the formation of voids in NaCl, which is followed by a sudden fracture of the material, presenting a potential problem in rock salt-based nuclear waste repositories. The temperature, dose rate and dose dependence of colloid growth in NaCl doped with different types of impurities is analyzed. We have found that colloid growth may become negative below a threshold temperature (or above a threshold dose rate), or below a certain impurity concentration , which is determined by the RSDE, that depends strongly on the type and concentration of the impurities. The results obtained with the model are compared with experimental observations.

  7. Failure Analysis of Heavy-Ion-Irradiated Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Casey, Megan C.; Lauenstein, Jean-Marie; Wilcox, Edward P.; Topper, Alyson D.; Campola, Michael J.; Label, Kenneth A.

    2017-01-01

    In this work, we use high- and low-magnitude optical microscope images, infrared camera images, and scanning electron microscope images to identify and describe the failure locations in heavy-ion-irradiated Schottky diodes.

  8. Destructive Single-Event Failures in Schottky Diodes

    NASA Technical Reports Server (NTRS)

    Casey, Megan C.; Lauenstein, Jean-Marie; Gigliuto, Robert A.; Wilcox, Edward P.; Phan, Anthony M.; Kim, Hak; Chen, Dakai; LaBel, Kenneth A.

    2014-01-01

    This presentation contains test results for destructive failures in DC-DC converters. We have shown that Schottky diodes are susceptible to destructive single-event effects. Future work will be completed to identify parameter that determines diode susceptibility.

  9. Development and fabrication of improved Schottky power diodes

    NASA Technical Reports Server (NTRS)

    Cordes, L. F.; Garfinkel, M.; Taft, E. A.

    1975-01-01

    Reproducible methods for the fabrication of silicon Schottky diodes have been developed for tungsten, aluminum, conventional platinum silicide, and low temperature platinum silicide. Barrier heights and barrier lowering under reverse bias have been measured, permitting the accurate prediction of forward and reverse diode characteristics. Processing procedures have been developed that permit the fabrication of large area (about 1 sq cm) mesageometry power Schottky diodes with forward and reverse characteristics that approach theoretical values. A theoretical analysis of the operation of bridge rectifier circuits has been performed, which indicates the ranges of frequency and voltage for which Schottky rectifiers are preferred to p-n junctions. Power Schottky rectifiers have been fabricated and tested for voltage ratings up to 140 volts.

  10. Low Schottky barriers on n-type silicon (001)

    NASA Astrophysics Data System (ADS)

    Tao, Meng; Agarwal, Shruddha; Udeshi, Darshak; Basit, Nasir; Maldonado, Eduardo; Kirk, Wiley P.

    2003-09-01

    It has been reported that no metal shows a Schottky barrier of less than 0.4 eV on n-type silicon (001). This is attributed to interface states between metal and silicon (001), which pin the interface Fermi level and make the Schottky barrier more or less independent of the metal work function. We demonstrate that, by terminating dangling bonds and relaxing strained bonds on the silicon (001) surface with a monolayer of selenium, low Schottky barriers can be obtained on n-type silicon (001). Aluminum and chromium show barrier heights of 0.08 and 0.26 eV on n-type silicon (001), respectively. These results agree well with the ideal Schottky barrier heights for aluminum and chromium on n-type silicon (001), but are significantly different from the experimental barrier heights known for four decades for these metals on n-type silicon (001).

  11. Measuring Schottky barrier height at graphene/SiC junction

    NASA Astrophysics Data System (ADS)

    Tomer, D.; Hudy, L.; Rajput, S.; Li, L.

    2014-03-01

    When graphene is interfaced with a semiconductor, a Schottky junction forms with rectifying properties. In this work, we measured the Schottky barrier heights of graphene/SiC Schottky diodes using current-voltage (I-V) measurement. Chemical vapor deposited graphene was transferred onto semiconductor surfaces of opposite polarization: the hydrogen-terminated Si- and C-faces of α-SiC, which was confirmed by Raman spectroscopy and scanning tunneling microscopy. The Schottky barrier height is found to be sensitive to the polarization of the substrate and surface preparation. On the Si-face, a barrier of 0.47 eV is found. These results will be compared with earlier work as well as our in situ scanning tunneling spectroscopy results. Supported by DOE (DE-FG02-07ER46228).

  12. Study of Reduced Graphene Oxide for Trench Schottky Diode

    NASA Astrophysics Data System (ADS)

    Samihah Khairir, Nur; Rofei Mat Hussin, Mohd; Nasir, Iskhandar Md; Mukhter Uz-Zaman, A. S. M.; Fazlida Hanim Abdullah, Wan; Sabirin Zoolfakar, Ahmad

    2015-11-01

    This paper presents the study of reduced Graphene Oxide (RGO) for trench Schottky diode by replacing conventional metal layer that forms schottky contact with a nanostructured carbon thin film via Reduced Graphene Oxide (RGO) technique. The RGO was synthesis by chemical exfoliation in which modified Hummer's method was approached. It was then deposited on the trench schottky pattern substrate by pressurized spray coating. The sample was then characterized by FESEM, Raman Spectroscopy and I-V test. The results of FESEM and Raman showed good characteristics and well deposited nanostructures of RGO flakes. The two-point I-V test showed that the samples have a low turn-on voltage and a higher break-down voltage, which is better than the conventional schottky diode used in the market.

  13. Characterization of as-grown and annealed GaAs: Structural defects and electrical properties

    SciTech Connect

    Lee, B.T.

    1988-07-01

    Structural defects in GaAs related to excess As were characterized and their behavior upon heat treatments studied. The observed defects included precipitates and dislocations. Results showed most of the precipitates in As-rich GaAs to the rhombohedral arsenic. Two exceptions were observed in an In-doped LEC (liguid encapsulated Czochralski) GaAs, which were As-rich but could not be further identified. Some of the observed As precipitates showed a simple orientation relationship with the matrix which yields structural coherence between As precipitates and GaAs matrix. Other As precipitates showed less coherent orientation. The dislocation loops in As-rich GaAs consisted a faulted loop with Shockley type Burgers vector and a perfect loop associated with an extra /l brace/111/r brace/ plane. It was proposed that these loops were formed as a result of dual condensation of both excess As interstitials and Ga vacancies, followed by generation and movement of Shockley partial dislocations. These precipitates and dislocation loops disappear after annealing, indicating a solvus temperature between 600--700/degree/C. The EL2 concentration increased as the defects dissolved, showing the defects to be the source of the excess As required to form EL2. The implication is that the As interstitial and Ga vacancies coexist in GaAs at high temperatures, which indicates that these point defects are responsible for the formation of arsenic antisites by direct combination. During the cooling period, they freeze into the matrix as point defects during a rapid cooling and condense as dislocation loops and precipitates during very slow cooling, in the dislocation-free region of the crystals. Around dislocations, the excess As precipitates heterogeneously even during rapid cooling. 217 refs.

  14. Rectification and Photoconduction Mapping of Axial Metal-Semiconductor Interfaces Embedded in GaAs Nanowires

    NASA Astrophysics Data System (ADS)

    Orrù, Marta; Piazza, Vincenzo; Rubini, Silvia; Roddaro, Stefano

    2015-10-01

    Semiconductor nanowires have emerged as an important enabling technology and are today used in many advanced device architectures, with an impact both for what concerns fundamental science and in view of future applications. One of the key challenges in the development of nanowire-based devices is the fabrication of reliable nanoscale contacts. Recent developments in the creation of metal-semiconductor junctions by thermal annealing of metallic electrodes offer promising perspectives. Here, we analyze the optoelectronic properties of nano-Schottky barriers obtained thanks to the controlled formation of metallic AuGa regions in GaAs nanowire. The junctions display a rectifying behavior and their transport characteristics are analyzed to extract the average ideality factor and barrier height in the current architecture. The presence, location, and properties of the Schottky junctions are cross-correlated with spatially resolved photocurrent measurements. Broadband light emission is reported in the reverse breakdown regime; this observation, combined with the absence of electroluminescence at forward bias, is consistent with the device unipolar nature.

  15. Radiation effects in GaAs AMOS solar cells

    NASA Technical Reports Server (NTRS)

    Shin, B. K.; Stirn, R. J.

    1979-01-01

    The results of radiation damage produced in AMOS (Antireflecting-Metal-Oxide-Semiconductor) cells with Sb2O3 interfacial oxide layers by 1-MeV electrons are presented. The degradation properties of the cells as a function of irradiation fluences were correlated with the changes in their spectral response, C-V, dark forward, and light I-V characteristics. The active n-type GaAs layers were grown by the OM-CVD technique, using sulfur doping in the range between 3 x 10 to the 15th power and 7 x 10 to the 16th power/cu cm. At a fluence of 10 to the 16th power e/sq cm, the low-doped samples showed I sub sc degradation of 8% and V sub oc degradation of 8%. The high-doped samples showed I sub sc and V sub oc degradation of 32% and 1%, respectively, while the fill factor remained relatively unchanged for both. AMOS cells with water vapor-grown interfacial layers showed no significant change in V sub oc.

  16. Sn nanothreads in GaAs: experiment and simulation

    NASA Astrophysics Data System (ADS)

    Semenikhin, I.; Vyurkov, V.; Bugaev, A.; Khabibullin, R.; Ponomarev, D.; Yachmenev, A.; Maltsev, P.; Ryzhii, M.; Otsuji, T.; Ryzhii, V.

    2016-12-01

    The gated GaAs structures like the field-effect transistor with the array of the Sn nanothreads was fabricated via delta-doping of vicinal GaAs surface by Sn atoms with a subsequent regrowth. That results in the formation of the chains of Sn atoms at the terrace edges. Two device models were developed. The quantum model accounts for the quantization of the electron energy spectrum in the self-consistent two-dimensional electric potential, herewith the electron density distribution in nanothread arrays for different gate voltages is calculated. The classical model ignores the quantization and electrons are distributed in space according to 3D density of states and Fermi-Dirac statistics. It turned out that qualitatively both models demonstrate similar behavior, nevertheless, the classical one is in better quantitative agreement with experimental data. Plausibly, the quantization could be ignored because Sn atoms are randomly placed along the thread axis. The terahertz hot-electron bolometers (HEBs) could be based on the structure under consideration.

  17. Bismuth alloying properties in GaAs nanowires

    SciTech Connect

    Ding, Lu; Lu, Pengfei; Cao, Huawei; Cai, Ningning; Yu, Zhongyuan; Gao, Tao; Wang, Shumin

    2013-09-15

    First-principles calculations have been performed to investigate the structural, electronic and optical properties of bismuth alloying in GaAs nanowires. A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration and the band edge shifts when spin–orbit coupling (SOC) is considered. The insertion of Bi atom leads to hybridization of Ga/As/Bi p states which contributes a lot around Fermi level. Scissor effect is involved. The optical properties are presented, including dielectric function, optical absorption spectra and reflectivity, which are also varied with the increasing of Bi concentrations. - Graphical abstract: Top view of Bi-doped GaAs nanowires. Ga, As, and Bi atoms are denoted with grey, purple and red balls, respectively. Display Omitted - Highlights: • A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. • The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration. • The band edge shifts when spin–orbit coupling (SOC) is considered. • The insertion of Bi atom leads to hybridization of Ga/As/Bi p states.

  18. Nanocrystalline diamond films as UV-semitransparent Schottky contacts to 4H-SiC

    NASA Astrophysics Data System (ADS)

    Tadjer, Marko J.; Hobart, Karl D.; Caldwell, Joshua D.; Butler, James E.; Liu, Kendrick X.; Eddy, Charles R.; Gaskill, D. Kurt; Lew, K. K.; VanMil, Brenda L.; Myers-Ward, Rachael L.; Ancona, Mario G.; Kub, Fritz J.; Feygelson, Tatyana I.

    2007-10-01

    A heterojunction between thin films of nanocrystalline diamond (NCD) and 4H-SiC has been developed. Undoped and B-doped NCDs were deposited on both n- and p- SiC epilayers. I-V measurements on p + NCD /n- SiC indicated Schottky rectifying behavior with a turn-on voltage of around 0.2V. The current increased over eight orders of magnitude with an ideality factor of 1.17 at 30°C. Ideal energy-band diagrams suggested a possible conduction mechanism for electron transport from the SiC conduction band to either the valence band or acceptor level of the NCD film. Applications as an UV semitransparent electrical contact to 4H-SiC are discussed.

  19. An 86-106 GHz quasi-integrated low noise Schottky receiver

    NASA Astrophysics Data System (ADS)

    Ali-Ahmad, Walid Y.; Bishop, William L.; Crowe, Thomas W.; Rebeiz, Gabriel M.

    1993-04-01

    An integrated planar receiver was developed and tested over the 82-112 GHz bandwidth. The quasi-integrated antenna used in the receiver has a high gain, a high Gaussian coupling efficiency, and a wide bandwidth. The novel mixer design consists of a planar GaAs Schottky diode placed at the feed of a dipole-probe suspended inside an integrated horn antenna. The diode uses an etched surface channel and a planar air bridge for reduced parasitic capacitance. At 92 GHz, the room-temperature antenna-mixer exhibits a double sideband conversion loss and noise temperature of 5.5 +/- 0.5 dB and 770 K +/- 50 K, respectively. The measured DSB conversion loss and noise temperature over a 20 GHz bandwidth (86 GHz-106 GHz) remain less than 6.2 dB +/- 0.5 dB and 1000 K +/- 50 K, respectively. The low cost of fabrication and simplicity of the design makes it ideal for millimeter- and submillimeter-wave receivers.

  20. Anisotropic transport in modulation doped quantum well structures

    NASA Technical Reports Server (NTRS)

    Radulescu, D. C.; Wicks, G. W.; Schaff, W. J.; Calawa, A. R.; Eastman, L. F.

    1987-01-01

    The degree of anisotropy in the anisotropic electron transport that has been observed in GaAs modulation-doped quantum wells grown by MBE on Al(0.3)Ga(0.7)As is related to the thickness and growth parameters of this substrate, which is grown just prior to the inverted interface. It is presently observed that the inverted interface has an anisotropic roughness which affects the 77 K low field electron transport parallel to the interface, and gives rise to anisotropic electron scattering in the GaAs modulation-doped quantum well.

  1. Understanding the enhanced photoelectrochemical activity of Ta doped hematite

    NASA Astrophysics Data System (ADS)

    Li, Huicheng; Niu, Dongfang; Liu, Deying; Huang, Wenjiao; Zhang, Xinsheng

    2017-07-01

    The improved photoactivity of Ta doped hematite, which was reported in our previous research, was studied by density functional theory (DFT) calculation and electrochemical measurement. The doping of Ta was calculated to produce slight changes in the local geometry of hematite crystal structure and have a low defect formation energy, indicating that the doping of Ta is energetically favorable and Ta impurity can be stably doped in hematite lattice to replace the Fe site (TaFe). The analysis of the electronic structure of Ta doped hematite indicates that the transition level of corresponding TaFe2+ defect (1.99 eV) lies below the conduction band minimum (CBM), meaning that the doping defect acts as shallow donor to provide more electron carrier, and thus improving the conductivity of hematite. The increased shallow donor density and the energy level induced by the doping of Ta were also confirmed by Mott-Schottky measurement.

  2. Patterned radial GaAs nanopillar solar cells.

    PubMed

    Mariani, Giacomo; Wong, Ping-Show; Katzenmeyer, Aaron M; Léonard, Francois; Shapiro, Joshua; Huffaker, Diana L

    2011-06-08

    Photovoltaic devices using GaAs nanopillar radial p-n junctions are demonstrated by means of catalyst-free selective-area metal-organic chemical vapor deposition. Dense, large-area, lithographically defined vertical arrays of nanowires with uniform spacing and dimensions allow for power conversion efficiencies for this material system of 2.54% (AM 1.5 G) and high rectification ratio of 213 (at ±1 V). The absence of metal catalyst contamination results in leakage currents of ∼236 nA at -1 V. High-resolution scanning photocurrent microscopy measurements reveal the independent functioning of each nanowire in the array with an individual peak photocurrent of ∼1 nA at 544 nm. External quantum efficiency shows that the photocarrier extraction highly depends on the degenerately doped transparent contact oxide. Two different top electrode schemes are adopted and characterized in terms of Hall, sheet resistance, and optical transmittance measurements.

  3. Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions

    PubMed Central

    Fontana, Marcio; Deppe, Tristan; Boyd, Anthony K.; Rinzan, Mohamed; Liu, Amy Y.; Paranjape, Makarand; Barbara, Paola

    2013-01-01

    Semiconducting molybdenum disulfphide has emerged as an attractive material for novel nanoscale optoelectronic devices due to its reduced dimensionality and large direct bandgap. Since optoelectronic devices require electron-hole generation/recombination, it is important to be able to fabricate ambipolar transistors to investigate charge transport both in the conduction band and in the valence band. Although n-type transistor operation for single-layer and few-layer MoS2 with gold source and drain contacts was recently demonstrated, transport in the valence band has been elusive for solid-state devices. Here we show that a multi-layer MoS2 channel can be hole-doped by palladium contacts, yielding MoS2 p-type transistors. When two different materials are used for the source and drain contacts, for example hole-doping Pd and electron-doping Au, the Schottky junctions formed at the MoS2 contacts produce a clear photovoltaic effect. PMID:23567328

  4. Electron-hole transport and photovoltaic effect in gated MoS2 Schottky junctions.

    PubMed

    Fontana, Marcio; Deppe, Tristan; Boyd, Anthony K; Rinzan, Mohamed; Liu, Amy Y; Paranjape, Makarand; Barbara, Paola

    2013-01-01

    Semiconducting molybdenum disulfphide has emerged as an attractive material for novel nanoscale optoelectronic devices due to its reduced dimensionality and large direct bandgap. Since optoelectronic devices require electron-hole generation/recombination, it is important to be able to fabricate ambipolar transistors to investigate charge transport both in the conduction band and in the valence band. Although n-type transistor operation for single-layer and few-layer MoS2 with gold source and drain contacts was recently demonstrated, transport in the valence band has been elusive for solid-state devices. Here we show that a multi-layer MoS2 channel can be hole-doped by palladium contacts, yielding MoS2 p-type transistors. When two different materials are used for the source and drain contacts, for example hole-doping Pd and electron-doping Au, the Schottky junctions formed at the MoS2 contacts produce a clear photovoltaic effect.

  5. Large barrier, highly uniform and reproducible Ni-Si/4H-SiC forward Schottky diode characteristics: testing the limits of Tung's model

    NASA Astrophysics Data System (ADS)

    Omar, Sabih U.; Sudarshan, Tangali S.; Rana, Tawhid A.; Song, Haizheng; Chandrashekhar, M. V. S.

    2014-07-01

    We report highly ideal (n < 1.1), uniform nickel silicide (Ni-Si)/SiC Schottky barrier (1.60-1.67 eV with a standard deviation <2.8%) diodes, fabricated on 4H-SiC epitaxial layers grown by chemical vapour deposition. The barrier height was constant over a wide epilayer doping range of 1014-1016 cm-3, apart from a slight decrease consistent with image force lowering. This remarkable uniformity was achieved by careful optimization of the annealing of the Schottky interface to minimize non-idealities that could lead to inhomogeneity. Tung's barrier inhomogeneity model was used to quantify the level of inhomogeneity in the optimized annealed diodes. The estimated ‘bulk’ barrier height (1.75 eV) was consistent with the Shockley-Mott limit for the Ni-Si/4H-SiC interface, implying an unpinned Fermi level. But the model was not useful to explain the poor ideality in unoptimized, as-deposited Schottky contacts (n = 1.6 - 2.5). We show analytically and numerically that only idealities n < 1.21 can be explained using Tung's model, irrespective of material system, indicating that the barrier height inhomogeneity is not the only cause of poor ideality in Schottky diodes. For explaining this highly non-ideal behaviour, other factors (e.g. interface traps, morphological defects, extrinsic impurities, etc) need to be considered.

  6. High resolution three-dimensional doping profiler

    DOEpatents

    Thundat, Thomas G.; Warmack, Robert J.

    1999-01-01

    A semiconductor doping profiler provides a Schottky contact at one surface and an ohmic contact at the other. While the two contacts are coupled to a power source, thereby establishing an electrical bias in the semiconductor, a localized light source illuminates the semiconductor to induce a photocurrent. The photocurrent changes in accordance with the doping characteristics of the semiconductor in the illuminated region. By changing the voltage of the power source the depth of the depletion layer can be varied to provide a three dimensional view of the local properties of the semiconductor.

  7. Ab Initio Investigation of the Structural, Electronic and Optical Properties of Cubic GaAs1- x P x Ternary Alloys Under Hydrostatic Pressure

    NASA Astrophysics Data System (ADS)

    Moussa, R.; Abdiche, A.; Abbar, B.; Guemou, M.; Riane, R.; Murtaza, G.; Omran, SAAD Bin; Khenata, R.; Soyalp, F.

    2015-12-01

    The structural, electronic and optical properties of the GaAs1- x P x ternary alloys together with their binary GaP and GaAs compounds were investigated in the zinc-blende (ZB) phase using the density functional theory. The lattice constant of the GaAs compound decreases while its bulk modulus increases when the doping concentration of the P dopant is increased. In addition, both parameters (lattice constant and bulk modulus) show small deviations from the linear concentration dependence. The energy band gap of the GaAs compound is of the direct nature, which increases with the increase in the P dopant concentration, whereas at higher P dopant concentration, the band gap shifts from direct to indirect character. On the other hand, the hydrostatic pressure has a significant effect on the band structure of the investigated compounds where the binary GaAs compound changes from a direct band gap semiconductor to an indirect band gap semiconductor at P ≥ 5 GPa. Furthermore, the pressure-dependence of the optical properties of the GaAs, GaP and GaAs0.75P0.25 alloy were also investigated, where the calculated zero frequency refractive index and the dielectric function are also compared with the experimental results as well as with different empirical models.

  8. Simulation of quantum dots size and spacing effect for intermediate band solar cell application based on InAs quantum dots arrangement in GaAs

    SciTech Connect

    Hendra, P. I. B. Rahayu, F. Darma, Y.

    2014-03-24

    Intermediate band solar cell (IBSC) has become a promising technology in increasing solar cell efficiency. In this work we compare absorption coefficient profile between InAs quantum dots with GaAs bulk. We calculate the efficiency of GaAs bulk and GaAs doped with 2, 5, and 10 nm InAs quantum dot. Effective distances in quantum dot arrangement based on electron tunneling consideration were also calculated. We presented a simple calculation method with low computing power demand. Results showed that arrangement of quantum dot InAs in GaAs can increase solar cell efficiency from 23.9 % initially up to 60.4%. The effective distance between two quantum dots was found 2 nm in order to give adequate distance to prevent electron tunneling and wave functions overlap.

  9. Half-metallicity at the Heusler alloy Co(2)Cr(0.5)Fe(0.5)Al(001) surface and its interface with GaAs(001).

    PubMed

    Zarei, Sareh; Javad Hashemifar, S; Akbarzadeh, Hadi; Hafari, Zohre

    2009-02-04

    Electronic and magnetic properties of the Heusler alloy Co(2)Cr(0.5)Fe(0.5)Al(001) surfaces and its interfaces with GaAs(001) are studied within the framework of density functional theory by using the plane-wave pseudopotential approach. The phase diagram obtained by ab initio atomistic thermodynamics shows that the CrAl surface is the most stable (001) termination of this Heusler alloy. We discuss that, at the ideal surfaces and interfaces with GaAs, half-metallicity of the alloy is lost, although the CrAl surface keeps high spin polarization. The energy band profile of the stable interface is investigated and a negative p Schottky barrier of -0.78 eV is obtained for this system.

  10. Defects on the Surface of Ti-Doped MgAl2O4 Nanophosphor.

    PubMed

    Lim, Jaehyuk; Kim, Yongseon; Kim, Sungdae; Kim, Youngwoon; Kang, Shinhoo

    2017-09-19

    Ti-doped nano MgAl2O4 for white emission was synthesized by combustion method. Extrinsic Schottky defects, Al vacancies and Ti(4+) dopant in Al sites, which are considered to be responsible for bluish-white emission, were observed by STEM on the surface of Ti-doped nano MgAl2O4 powder. The stabilities of the Schottky defect associates, (TiAl(·)-VAl''')'', were demonstrated by DFT calculation. The emission behavior was interpreted with these results.

  11. Role of GaAs surface clearing in plasma deposition of silicon nitride films for encapsulated annealing

    NASA Technical Reports Server (NTRS)

    Valco, G. J.; Kapoor, V. J.

    1985-01-01

    The role of GaAs surface cleaning and plasma reactor cleaning prior to deposition of silicon nitride films for encapsulated annealing has been investigated. X-ray photoelectron spectroscopy was employed to determine the surface characteristics of GaAs treated with HCl, HF, and NH4OH solutions preceded by a degreasing procedure. The HCl clean left the least amount of oxygen on the surface. Fluorine contamination resulting from the CF4 plasma used to clean the reactor was found to be located at the film-substrate interface by Auger electron spectroscopy with argon-ion sputtering. A modified deposition procedure was developed to eliminate the fluorine contamination. Plasma deposition of silicon nitride encapsulating films was found to modify the I-V characteristics of Schottky diodes subsequently formed on GaAs surface. The reverse current of the diodes was slightly reduced. Substrates implanted with Si at 100 keV and a dose of 5 x 10 to the 12th/sq cm showed a peak electron concentration of 1.7 x 10 to the 17th/cu cm at a depth of 0.1-micron with 60 percent activation after encapsulation and annealing at 800 C for 7 min.

  12. Effect of rapid thermal annealing on the noise properties of InAs /GaAs quantum dot structures

    NASA Astrophysics Data System (ADS)

    Arpatzanis, N.; Tsormpatzoglou, A.; Dimitriadis, C. A.; Song, J. D.; Choi, W. J.; Lee, J. I.; Charitidis, C.

    2007-09-01

    Self-assembled InAs quantum dots (QDs) were grown by molecular beam epitaxy (MBE) on n+-GaAs substrates, capped between 0.4μm thick n-type GaAs layers with electron concentration of 1×1016cm-3. The effect of rapid thermal annealing at 700°C for 60s on the noise properties of the structure has been investigated using Au /n-GaAs Schottky diodes as test devices. In the reference sample without containing QDs, the noise spectra show a generation-recombination (g-r) noise behavior due to a discrete energy level located about 0.51eV below the conduction band edge. This trap is ascribed to the M4 (or EL3) trap in GaAs MBE layers, related to a chemical impurity-native defect complex. In the structure with embedded QDs, the observed g-r noise spectra are due to a midgap trap level ascribed to the EL2 trap in GaAs, which is related to the InAs QDs dissolution due to the thermal treatment.

  13. Role of GaAs surface clearing in plasma deposition of silicon nitride films for encapsulated annealing

    NASA Technical Reports Server (NTRS)

    Valco, G. J.; Kapoor, V. J.

    1985-01-01

    The role of GaAs surface cleaning and plasma reactor cleaning prior to deposition of silicon nitride films for encapsulated annealing has been investigated. X-ray photoelectron spectroscopy was employed to determine the surface characteristics of GaAs treated with HCl, HF, and NH4OH solutions preceded by a degreasing procedure. The HCl clean left the least amount of oxygen on the surface. Fluorine contamination resulting from the CF4 plasma used to clean the reactor was found to be located at the film-substrate interface by Auger electron spectroscopy with argon-ion sputtering. A modified deposition procedure was developed to eliminate the fluorine contamination. Plasma deposition of silicon nitride encapsulating films was found to modify the I-V characteristics of Schottky diodes subsequently formed on GaAs surface. The reverse current of the diodes was slightly reduced. Substrates implanted with Si at 100 keV and a dose of 5 x 10 to the 12th/sq cm showed a peak electron concentration of 1.7 x 10 to the 17th/cu cm at a depth of 0.1-micron with 60 percent activation after encapsulation and annealing at 800 C for 7 min.

  14. Optoelectronic gain control of a microwave single stage GaAs MESFET amplifier

    NASA Technical Reports Server (NTRS)

    Simons, Rainee N.

    1988-01-01

    Gain control of a single stage GaAs MESFET amplifier is demonstrated by the use of optical illumination of photon energy greater than the GaAs bandgap. The optical illumination is supplied by a semiconductor laser diode and is coupled to the Schottky gate of the MESFET by an optical fiber. The increase in gain is observed to be as much as 5.15 dB when the MESFET is biased close to pinchoff, that is, V(sub gs) equals -1.5 V and with optical illumination of 1.5 mW. The computed maximum available gain (MAG) and current gain (bar h sub 21 bar) from the de-embedded s-parameters show that MAG is unaffected by optical illumination, however, bar h(sub 21)bar increases by more than 2 dB under optical illumination of 1.5 mW. The maximum frequency of oscillation (F sub max) and the unity current gain cut-off frequency (F sub t) obtained by extrapolating the MAG and bar h(sub 21)bar curves, respectively, show that the F(sub max) is insensitive to optical illumination but F(sub t) increases by 5 GHz.

  15. Characterization of GaAs solar cells made by ion implantation and rapid thermal annealing using selective photoetching

    SciTech Connect

    van Sark, W.G.J.H.M.; Weyher, J.L.; Giling, L.J. ); de Potter, M.; van Rossum, M. )

    1990-05-01

    Shallow {ital n}-{ital p} GaAs solar cells have been made by implantation of Si into Zn-doped ({ital p}-type) GaAs substrates followed by rapid thermal annealing. The structure of the GaAs crystal has been determined by the DSL photoetching method (Diluted Sirtl-like etchants used with Light). It was found that implantation-induced-damage (revealed by DSL as microroughness and craters) was not removed after annealing for energies exceeding 60 keV. This leads to substrates that contain many precipitates, which appears to be disastrous for the fabrication of good solar cells. In addition, good cell performance is hampered by compensation effects in the {ital n}-{ital p} transition region and in the {ital n}-type layer itself.

  16. Interplay between quantum well width and interface roughness for electron transport mobility in GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Kamburov, D.; Baldwin, K. W.; West, K. W.; Shayegan, M.; Pfeiffer, L. N.

    2016-12-01

    We report transport mobility measurements for clean, two-dimensional (2D) electron systems confined to GaAs quantum wells (QWs), grown via molecular beam epitaxy, in two families of structures, a standard, symmetrically doped GaAs set of QWs with Al0.32Ga0.68As barriers and one with additional AlAs cladding surrounding the QWs. Our results indicate that the mobility in narrow QWs with no cladding is consistent with existing theoretical calculations where interface roughness effects are softened by the penetration of the electron wave function into the adjacent low barriers. In contrast, data from AlAs-clad wells show a number of samples where the 2D electron mobility is severely limited by interface roughness. These measurements across three orders of magnitude in mobility provide a road map of reachable mobilities in the growth of GaAs structures of different electron densities, well widths, and barrier heights.

  17. Schottky barrier height measurements of Cu/Si(001), Ag/Si(001), and Au/Si(001) interfaces utilizing ballistic electron emission microscopy and ballistic hole emission microscopy

    SciTech Connect

    Balsano, Robert; Matsubayashi, Akitomo; LaBella, Vincent P.

    2013-11-15

    The Schottky barrier heights of both n and p doped Cu/Si(001), Ag/Si(001), and Au/Si(001) diodes were measured using ballistic electron emission microscopy and ballistic hole emission microscopy (BHEM), respectively. Measurements using both forward and reverse ballistic electron emission microscopy (BEEM) and (BHEM) injection conditions were performed. The Schottky barrier heights were found by fitting to a linearization of the power law form of the Bell-Kaiser BEEM model. The sum of the n-type and p-type barrier heights are in good agreement with the band gap of silicon and independent of the metal utilized. The Schottky barrier heights are found to be below the region of best fit for the power law form of the BK model, demonstrating its region of validity.

  18. High-efficiency, radiation-resistant GaAs space cells

    NASA Technical Reports Server (NTRS)

    Bertness, K. A.; Ristow, M. Ladle; Grounner, M.; Kuryla, M. S.; Werthen, J. G.

    1991-01-01

    Although many GaAs solar cells are intended for space applicatons, few measurements of cell degradation after radiation are available, particularly for cells with efficiencies exceeding 20 percent (one-sun, AMO). Often the cell performance is optimized for the highest beginning-of-life (BOL) efficiency, despite the unknown effect of such design on end-of-life (EOL) efficiencies. The results of a study of the radiation effects on p-n GaAs cells are presented. The EOL efficiency of GaAs space cell can be increased by adjusting materials growth parameters, resulting in a demonstration of 16 percent EOL efficiency at one-sun, AMO. Reducing base doping levels to below 3 x 10(exp 17)/cu m and decreasing emitter thickness to 0.3 to 0.5 micron for p-n cells led to significant improvements in radiation hardness as measured by EOL/BOL efficiency ratios for irradiation of 10(exp -15)/sq cm electrons at 1 MeV. BOL efficiency was not affected by changes in emitter thickness but did improve with lower base doping.

  19. Schottky Heterodyne Receivers With Full Waveguide Bandwidth

    NASA Technical Reports Server (NTRS)

    Hesler, Jeffrey; Crowe, Thomas

    2011-01-01

    Compact THz receivers with broad bandwidth and low noise have been developed for the frequency range from 100 GHz to 1 THz. These receivers meet the requirements for high-resolution spectroscopic studies of planetary atmospheres (including the Earth s) from spacecraft, as well as airborne and balloon platforms. The ongoing research is significant not only for the development of Schottky mixers, but also for the creation of a receiver system, including the LO chain. The new receivers meet the goals of high sensitivity, compact size, low total power requirement, and operation across complete waveguide bands. The exceptional performance makes these receivers ideal for the broader range of scientific and commercial applications. These include the extension of sophisticated test and measurement equipment to 1 THz and the development of low-cost imaging systems for security applications and industrial process monitoring. As a particular example, a WR-1.9SHM (400-600 GHz) has been developed (see Figure 1), with state-of-the-art noise temperature ranging from 1,000-1,800 K (DSB) over the full waveguide band. Also, a Vector Network Analyzer extender has been developed (see Figure 2) for the WR1.5 waveguide band (500 750 GHz) with 100-dB dynamic range.

  20. Dye-sensitized Schottky barrier solar cells

    DOEpatents

    Skotheim, Terje A.

    1978-01-01

    A low-cost dye-sensitized Schottky barrier solar cell comprised of a substrate of semiconductor with an ohmic contact on one face, a sensitizing dye adsorbed onto the opposite face of the semiconductor, a transparent thin-film layer of a reducing agent over the dye, and a thin-film layer of metal over the reducing agent. The ohmic contact and metal layer constitute electrodes for connection to an external circuit and one or the other or both are made transparent to permit light to penetrate to the dye and be absorbed therein for generating electric current. The semiconductor material chosen to be the substrate is one having a wide bandgap and which therefore is transparent; the dye selected is one having a ground state within the bandgap of the semiconductor to generate carriers in the semiconductor, and a first excited state above the conduction band edge of the semiconductor to readily conduct electrons from the dye to the semiconductor; the reducing agent selected is one having a ground state above the ground state of the sensitizer to provide a plentiful source of electrons to the dye during current generation and thereby enhance the generation; and the metal for the thin-film layer of metal is selected to have a Fermi level in the vicinity of or above the ground state of the reducing agent to thereby amply supply electrons to the reducing agent.

  1. Crystal Orientation Controlled Photovoltaic Properties of Multilayer GaAs Nanowire Arrays.

    PubMed

    Han, Ning; Yang, Zai-Xing; Wang, Fengyun; Yip, SenPo; Li, Dapan; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C

    2016-06-28

    In recent years, despite significant progress in the synthesis, characterization, and integration of various nanowire (NW) material systems, crystal orientation controlled NW growth as well as real-time assessment of their growth-structure-property relationships still presents one of the major challenges in deploying NWs for practical large-scale applications. In this study, we propose, design, and develop a multilayer NW printing scheme for the determination of crystal orientation controlled photovoltaic properties of parallel GaAs NW arrays. By tuning the catalyst thickness and nucleation and growth temperatures in the two-step chemical vapor deposition, crystalline GaAs NWs with uniform, pure ⟨110⟩ and ⟨111⟩ orientations and other mixture ratios can be successfully prepared. Employing lift-off resists, three-layer NW parallel arrays can be easily attained for X-ray diffraction in order to evaluate their growth orientation along with the fabrication of NW parallel array based Schottky photovoltaic devices for the subsequent performance assessment. Notably, the open-circuit voltage of purely ⟨111⟩-oriented NW arrayed cells is far higher than that of ⟨110⟩-oriented NW arrayed counterparts, which can be interpreted by the different surface Fermi level pinning that exists on various NW crystal surface planes due to the different As dangling bond densities. All this indicates the profound effect of NW crystal orientation on physical and chemical properties of GaAs NWs, suggesting the careful NW design considerations for achieving optimal photovoltaic performances. The approach presented here could also serve as a versatile and powerful platform for in situ characterization of other NW materials.

  2. Pulse transformer for GaAs laser

    NASA Technical Reports Server (NTRS)

    Rutz, E. M.

    1976-01-01

    High-radiance gallium arsenide (GaAs) laser operating at room temperature is utilized in optical navigation system. For efficient transformer-to-laser impedance match, laser should be connected directly to pulse transformer secondary winding.

  3. Long-wavelength PtSi infrared detectors fabricated by incorporating a p(+) doping spike grown by molecular beam epitaxy

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Park, J. S.; George, T.; Jones, E. W.; Fathauer, R. W.; Maserjian, J.

    1993-01-01

    By incorporating a 1-nm-thick p(+) doping spike at the PtSi/Si interface, we have successfully demonstrated extended cutoff wavelengths of PtSi Schottky infrared detectors in the long wavelength infrared (LWIR) regime for the first time. The extended cutoff wavelengths resulted from the combined effects of an increased electric field near the silicide/Si interface due to the p(+) doping spike and the Schottky image force. The p(+) doping spikes were grown by molecular beam epitaxy at 450 C, using elemental boron as the dopant source, with doping concentrations ranging from 5 x 10 exp 19 to 2 x 10 exp 20/cu cm. Transmission electron microscopy indicated good crystalline quality of the doping spikes. The cutoff wavelengths were shown to increase with increasing doping concentrations of the p(+) spikes. Thermionic emission dark current characteristics were observed and photoresponses in the LWIR regime were demonstrated.

  4. Long-wavelength PtSi infrared detectors fabricated by incorporating a p(+) doping spike grown by molecular beam epitaxy

    NASA Technical Reports Server (NTRS)

    Lin, T. L.; Park, J. S.; George, T.; Jones, E. W.; Fathauer, R. W.; Maserjian, J.

    1993-01-01

    By incorporating a 1-nm-thick p(+) doping spike at the PtSi/Si interface, we have successfully demonstrated extended cutoff wavelengths of PtSi Schottky infrared detectors in the long wavelength infrared (LWIR) regime for the first time. The extended cutoff wavelengths resulted from the combined effects of an increased electric field near the silicide/Si interface due to the p(+) doping spike and the Schottky image force. The p(+) doping spikes were grown by molecular beam epitaxy at 450 C, using elemental boron as the dopant source, with doping concentrations ranging from 5 x 10 exp 19 to 2 x 10 exp 20/cu cm. Transmission electron microscopy indicated good crystalline quality of the doping spikes. The cutoff wavelengths were shown to increase with increasing doping concentrations of the p(+) spikes. Thermionic emission dark current characteristics were observed and photoresponses in the LWIR regime were demonstrated.

  5. Laser Annealing of GaAs

    DTIC Science & Technology

    1978-12-01

    annealing implanted layers. Sheet resistance measurements made on the irradiated semi- insulating GaAs samples indicate no significant change in the... sheet resistance after laser irradiation (typical decrease in the sheet resistance after laser irradiation was found to be less than a factor of two...OF THE SHEET - RESISTANCE (P ) THE EFFECTIVE SHEET ELECTRON CONCENTRATION (N ), AND THE EFFECTIVE MOBILITY _u)FOR SEMIb- INSULATING GaAs IMPLANTED WITH

  6. Ohmic contact to GaAs semiconductor

    NASA Technical Reports Server (NTRS)

    Hovel, H. J.; Woodall, J. M.

    1980-01-01

    Multimetallic layers produce stable, low-resistance contacts for p-type GaAs and p-type GaAlAs devices. Contacts present no leakage problems, and their series resistance is too small to measure at 1 Sun intensity. Ohmic contacts are stable and should meet 20-year-life requirement at 150 C for GaAs combined photothermal/photovoltaic concentrators.

  7. GaAs homojunction solar cell development

    NASA Technical Reports Server (NTRS)

    Flood, D. J.; Swartz, C. K.; Hart, R. E., Jr.

    1980-01-01

    The Lincoln Laboratory n(+)/p/p(+) GaAs shallow homojunction cell structure was successfully demonstrated on 2 by 2 cm GaAs substrates. Air mass zero efficiencies of the seven cells produced to date range from 13.6 to 15.6 percent. Current voltage (I-V) characteristics, spectral response, and measurements were made on all seven cells. Preliminary analysis of 1 MeV electron radiation damage data indicate excellent radiation resistance for these cells.

  8. Direct-bonded four-junction GaAs solar cells

    NASA Astrophysics Data System (ADS)

    Jingman, Shen; Lijie, Sun; Kaijian, Chen; Wei, Zhang; Xunchun, Wang

    2015-06-01

    Direct wafer bonding technology is able to integrate two smooth wafers and thus can be used in fabricating III-V multijunction solar cells with lattice mismatch. In order to monolithically interconnect between the GaInP/GaAs and InGaAsP/InGaAs subcells, the bonded GaAs/InP heterojunction must be a highly conductive ohmic junction or a tunnel junction. Three types of bonding interfaces were designed by tuning the conduction type and doping elements of GaAs and InP. The electrical properties of p-GaAs (Zn doped)/n-InP (Si doped), p-GaAs (C doped)/n-InP (Si doped) and n-GaAs (Si doped)/n-InP (Si doped) bonded heterojunctions were analyzed from the I-V characteristics. The wafer bonding process was investigated by improving the quality of the sample surface and optimizing the bonding parameters such as bonding temperature, bonding pressure, bonding time and so on. Finally, GaInP/GaAs/InGaAsP/InGaAs 4-junction solar cells have been prepared by a direct wafer bonding technique with the high efficiency of 34.14% at the AM0 condition (1 Sun). Project supported by the Shanghai Rising-Star Program (No. 14QB1402800).

  9. Low resistance Pd/Zn/Pd Au ohmic contacts to P-type gaas

    NASA Astrophysics Data System (ADS)

    Bruce, R.; Clark, D.; Eicher, S.

    1990-03-01

    Many optoelectronic devices require contacts to p-doped epitaxial layers. To achieve low contact resistance, the semiconductor has to be doped to high levels. The p-dopants most commonly used are Be, Mg, and Zn. The contacts were formed by the sequential e-beam evaporation of 10 nm Pd, ≤5 nm Zn, 20 nm Pd and 40 nm Au layers onto a 0.2 μm thick Be-doped (5 × 1018 cm) GaAs layer grown by MBE. The minimum contact resistance of 0.04 Ω-mm (≤1 × 10-7 Ω-cm2), as measured using the transmission line method, was obtained for contacts annealed at 500° C for 30s. These are the lowest contact resistance values reported to date for alloyed contacts to p-GaAs.

  10. Studies of Nonradiative Recombination Centers in GaAs and InP*

    NASA Astrophysics Data System (ADS)

    Tuzemen, S.; Liang, Difei; Ucer, K. B.; Williams, R. T.

    2001-03-01

    The "reverse contrast" recombination center in semi-insulating GaAs, so named because of its anti-correlation with EL2 defects in spatial mapping, has been attributed to As-vacancy centers.^1 Several details of the nature of its optical transitions and of its spatial distribution are among questions open to experimental investigation. We report experiments on spectroscopy and spatial mapping of defects in semi-insulating GaAs and Fe-doped InP. *ST acknowledges the CIES for support as a Fulbright Scholar at WFU. The research at WFU is supported by NSF grant DMR-9732023. Confocal microscopy in cooperation with K. Grant and the MicroMed Facility of WFU. 1. C. Le Berre, C. Corbel, R. Mih, M. R. Brozel, S. Tüzemen, S. Kuisma, K. Saarinen, P. Hautojarvi, and R. Fornari, Appl. Phys. Lett. 66, 2354 (1995).

  11. High-efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1979-01-01

    GaAs chemical vapor deposition (CVD) growth on single-crystal GaAs substrates was investigated over a temperature range of 600 to 750 C, As/GA mole-ratio range of 3 to 11, and gas molefraction range 5 x 10 to the minus 9th power to 7x 10 to the minus 7th power for H2S doping. GasAs CVD growth on recrystallized Ge films was investigated for a temperature range of 550 to 700 C, an As/GA mole ratio of 5, and for various H2S mole fraction. The highest efficiency cell observed on these films with 2 mm dots was 4.8% (8% when AR-coated). Improvements in fill factor and opencircuit voltage by about 40% each are required in order to obtain efficiencies of 15% or greater.

  12. Sulfur passivation and contact methods for GaAs nanowire solar cells.

    PubMed

    Tajik, N; Peng, Z; Kuyanov, P; LaPierre, R R

    2011-06-03

    The effect of sulfur passivation on core-shell p-n junction GaAs nanowire (NW) solar cells has been investigated. Devices of two types were investigated, consisting of indium tin oxide contact dots or opaque Au finger electrodes. Lateral carrier transport from the NWs to the contact fingers was achieved via a p-doped GaAs surface conduction layer. NWs between the opaque contact fingers had sidewall surfaces exposed for passivation by sulfur. The relative cell efficiency increased by 19% upon passivation. The contribution of the thin film grown between the NWs to the total cell efficiency was estimated by removing the NWs using a sonication procedure. Mechanisms of carrier transport and photovoltaic effects are discussed on the basis of spatially resolved laser scanning measurements.

  13. Spatial distribution of carbon and native defects in large-diameter bulk grown GaAs

    SciTech Connect

    Walukiewicz, W.; Bourret, E.; Yau, W.F.; Mc Murray, R.E. Jr.; Haller, E.E.; Bliss, D.

    1987-04-01

    Different spectroscopic techniques have been combined to measure concentrations of carbon on arsenic sites and of neutral EL2. Utilizing the recently found dependence of the high resolution local vibrational mode spectrum on the charge state of the carbon acceptors we have been able to separately determine concentrations of neutral and ionized carbon after EL2 has been optically quenched. The concentration of ionized carbon shows a very distinct W-shaped variation across the wafer whereas the total carbon concentration is close to constant. The variations are caused by the nonuniform distribution of donors which are shallower than EL2. The account for the commonly observed variations of the near infrared absorption. Radiotracer experiments with GaAs crystals intentionally doped with /sup 14/C showed that carbon is very homogeneously distributed in GaAs grown by horizontal Bridgman method. No correlation between the distribution of carbon and dislocations has been found. 17 refs., 5 figs.

  14. GALLIUM ARSENIDE (GaAs)

    NASA Astrophysics Data System (ADS)

    Levinshtein, M. E.; Rumyantsev, S. L.

    The following sections are included: * Basic Parameters at 300 K * Band Structure and Carrier Concentration * Temperature Dependences * Dependences on Hydrostatic Pressure * Energy Gap Narrowing at High Doping Levels * Effective Masses * Donors and Acceptors * Electrical Properties * Mobility and Hall Effect * Transport Properties in High Electric Field * Impact Ionization * Recombination Parameters * Optical Properties * Thermal Properties * Mechanical Properties, Elastic Constants, Lattice Vibrations, Other Properties * References

  15. I-V characteristics simulation of silicon carbide Ti/4H-SiC Schottky diode

    NASA Astrophysics Data System (ADS)

    Panchenko, P.; Rybalka, S.; Malakhanov, A.; Krayushkina, E.; Radkov, A.

    2016-12-01

    The simulation of current-voltage characteristics for 4H-SiC Schottky diode with Ti Schottky contact has been carried out with used of TCAD program. Obtained current-voltage characteristics has been analyzed and compared with theoretical and experimental results. It is established that the Schottky diode parameters (forward current, ideality coefficient, Schottky barrier height, breakdown voltage) obtained in proposed model are good agreement with data for such type diodes.

  16. Growth of InSe:Mn semiconductor crystals by Bridgman-Stockbarger technique and analysis of electron irradiation effects on Sn/InSe:Mn Schottky diodes

    NASA Astrophysics Data System (ADS)

    Çınar Demir, K.; Tekle, T.; Gurbulak, B.; Aydoğan, Ş.; Coşkun, C.; Ekinci, D.

    2016-05-01

    Mn-doped p-InSe semiconductor crystals were grown by Bridgman -Stockbarger technique. The crystals were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and fabricated Sn/InSe:Mn Schottky diodes. The current-voltage (I-V) and capacitance-voltage (C-V) measurements of diodes were investigated to determine the response of devices to electron irradiation with 9 MeV energy and 1.2 × 1010 e- cm-2 dose. After irradiation, the ideality factor and barrier height of the Sn/InSe:Mn Schottky diode were determined as 1.66 and 0.85 eV, respectively. Before irradiation, they were determined as 1.37 and 0.90 eV, respectively. It has been concluded that the radiation with high energy may contribute to form defects at the interface of the Sn/InSe:Mn device.

  17. High-performance single CdS nanowire (nanobelt) Schottky junction solar cells with Au/graphene Schottky electrodes.

    PubMed

    Ye, Yu; Dai, Yu; Dai, Lun; Shi, Zujin; Liu, Nan; Wang, Fei; Fu, Lei; Peng, Ruomin; Wen, Xiaonan; Chen, Zhijian; Liu, Zhongfan; Qin, Guogang

    2010-12-01

    High-performance single CdS nanowire (NW) as well as nanobelt (NB) Schottky junction solar cells were fabricated. Au (5 nm)/graphene combined layers were used as the Schottky contact electrodes to the NWs (NBs). Typical as-fabricated NW solar cell shows excellent photovoltaic behavior with an open circuit voltage of ∼0.15 V, a short circuit current of ∼275.0 pA, and an energy conversion efficiency of up to ∼1.65%. The physical mechanism of the combined Schottky electrode was discussed. We attribute the prominent capability of the devices to the high-performance Schottky combined electrode, which has the merits of low series resistance, high transparency, and good Schottky contact to the CdS NW (NB). Besides, a promising site-controllable patterned graphene transfer method, which has the advantages of economizing graphene material and free from additional etching process, was demonstrated in this work. Our results suggest that semiconductor NWs (NBs) are promising materials for novel solar cells, which have potential application in integrated nano-optoelectronic systems.

  18. Charge Transport at Ti-Doped Hematite (001)/Aqueous Interfaces

    SciTech Connect

    Chatman, Shawn ME; Pearce, Carolyn I.; Rosso, Kevin M.

    2015-03-10

    Solid-state transport and electrochemical properties of Ti-doped hematite (001) epitaxial thin films (6.0, 8.3, and 16.6 at% Ti) were probed to achieve a better understanding of doped hematite for photoelectrochemical (PEC) applications. Room temperature resistivity measurements predict a resistivity minimum near 10 at% Ti doping, which can be rationalized as maximizing charge compensating Fe2+ concentration and Fe3+ electron accepting percolation pathways simultaneously. Temperature dependent resistivity data are consistent with small polaron hopping, revealing an activation energy that is Ti concentration dependent and commensurate with previously reported values (≈ 0.11 eV). In contact with inert electrolyte, linear Mott-Schottky data at various pH values indicate that there is predominantly a single donor for Ti-doped hematite at 6.0 at% Ti and 16.6 at% Ti concentrations. Two slope Mott-Schottky data at pH extremes indicate the presence of a second donor or surface state in the 8.3 at% Ti-doped film, with an energy level ≈ 0.7 eV below the Fermi level. Mott-Schottky plots indicate pH and Ti concentration dependent flatband potentials of -0.4 to -1.1 V vs. Ag/AgCl, commensurate with previously reported data. Flatband potentials exhibited super-Nernstian pH dependence ranging from -69.1 to -101.0 mV/pH. Carrier concentration data indicate that the Fermi energy of the Ti-doped system is Ti concentration dependent, with a minimum of 0.15 eV near 10 at% Ti. These energy level data allow us to construct an energy band diagram for Ti-doped hematite electrode/electrolyte interfaces, and to determine a Ti-doping concentration t

  19. Direct Measurement of Quantum Confinement and Environmental Pinning Effects on Metal/Nanostructure Schottky Contacts

    NASA Astrophysics Data System (ADS)

    Tivarus, Cristian

    2005-03-01

    I will discuss direct nm-resolution measurements of metal/quantum well (QW) Schottky contacts made using Cross- sectional Ballistic Electron Emission Microscopy (XBEEM), in order to quantify the influence of small-size effects on hot- carrier injection into semiconductor nanostructures. Molecular Beam Epitaxy was used to grow a sequence of GaAs QWs with width varying from 1nm to 15 nm, separated by thick Al0.3Ga0.7As barrier layers. The samples were cleaved ex-situ and polycrystalline Au contacts were electron-beam evaporated on the cleaved edge using shadow mask or photo-lithography. Samples were studied in ultra-high vacuum using Scanning Tunneling Microscopy and XBEEM. The Schottky barrier height over the QWs was found to systematically increase with decreasing QW width, by up to ˜140 meV for the 1 nm QW. This is mostly due to a large quantum-confinement increase ( up to ˜200 meV) of the QW conduction band minimum (CBM), as estimated by a simple 1D QW model. We also did finite element electrostatic modeling to estimate the ``environmental" effects of the surrounding metal/Al0.3Ga0.7As interface on the QW CBM. Excellent quantitative agreement over the full QW width range is obtained when both quantum confinement and electrostatic effects are considered.I will also discuss on-going measurements to use the metal/QW nanocontacts as unique ``nano-apertures" to directly image and quantify the lateral hot-electron spreading profile in the metal film. This profile is surprisingly large, with a FWHM of ˜15nm (˜21nm) for a 4nm (7nm) thick Au film. XBEEM images directly show that hot-electron spreading is strongly modified by the grain structure in the metal film. In collaboration with J.P. Pelz, M.K. Hudait, and S.A. Ringel. Work supported by NSF and ONR

  20. Electromechanical resistive switching via back-to-back Schottky junctions

    SciTech Connect

    Li, Lijie

    2015-09-15

    The physics of the electromechanical resistive switching is uncovered using the theory of back-to-back Schottky junctions combined with the quantum domain space charge transport. A theoretical model of the basic element of resistive switching devices realized by the metal-ZnO nanowires-metal structure has been created and analyzed. Simulation results show that the reverse biased Schottky junction and the air gap impedance dominate the current-voltage relation at higher external voltages; thereby electromechanically varying the air gap thickness causes the device exhibit resistive tuning characteristics. As the device dimension is in nanometre scale, investigation of the model based on quantum mechanics has also been conducted.

  1. Simulation and measurement of the resonant Schottky pickup

    NASA Astrophysics Data System (ADS)

    Zang, Yong-Dong; Wu, Jun-Xia; Zhao, Tie-Cheng; Zhang, Sheng-Hu; Mao, Rui-Shi; Xu, Hu-Shan; Sun, Zhi-Yu; Ma, Xin-Wen; Tu, Xiao-Lin; Xiao, Guo-Qing; Nolden, F.; Hülsmann, P.; Yu., A. Litvinov; Peschke, C.; Petri, P.; S. Sanjari, M.; Steck, M.

    2011-12-01

    A resonant Schottky pickup with high sensitivity, built by GSI, will be used for nuclear mass and lifetime measurement at CSRe. The basic concepts of Schottky noise signals, a brief introduction of the geometry of the detector, the transient response of the detector, and MAFIA simulated and perturbation measured results of characteristics are presented in this paper. The resonant frequency of the pickup is about 243 MHz and can be slightly changed at a range of 3 MHz. The unloaded quality factor is about 1072 and the shunt impedance is 76 kΩ. The measured results of the characteristics are in agreement with the MAFIA simulations.

  2. High voltage, high current Schottky barrier solar cell

    NASA Technical Reports Server (NTRS)

    Stirn, R. J. (Inventor)

    1977-01-01

    A Schottky barrier solar cell was described, which consists of a layer of wide band gap semiconductor material on which a very thin film of semitransparent metal was deposited to form a Schottky barrier. The layer of the wide band gap semiconductor material is on top of a layer of narrower band gap semiconductor material, to which one of the cell's contacts may be attached directly or through a substrate. The cell's other contact is a grid structure which is deposited on the thin metal film.

  3. Photo effects at the Schottky interface in extraordinary optoconductance

    NASA Astrophysics Data System (ADS)

    Tran, L. C.; Werner, F. M.; Newaz, A. K. M.; Solin, S. A.

    2013-10-01

    Non-uniform optical illuminations near the Schottky interface of Ti/GaAs metal-semiconductor hybrid (MSH) structures induce local photovoltages transverse and lateral to the interface. In these VLSI-compatible, room temperature optical sensors, the optical response of the MSH resistance is directly linked to the Schottky barrier behavior. In order to correlate the interface behavior with the overall heterostructure behavior, quantities such as transverse photovoltage, lateral photovoltage, and resistance are all recorded as a function of laser spot location. The interface's photovoltaic dependence on intensity is consistent with a MSH in which quantum efficiency is independent of optical intensity.

  4. SiC-Based Schottky Diode Gas Sensors

    NASA Technical Reports Server (NTRS)

    Hunter, Gary W.; Neudeck, Philip G.; Chen, Liang-Yu; Knight, Dak; Liu, Chung-Chiun; Wu, Quing-Hai

    1997-01-01

    Silicon carbide based Schottky diode gas sensors are being developed for high temperature applications such as emission measurements. Two different types of gas sensitive diodes will be discussed in this paper. By varying the structure of the diode, one can affect the diode stability as well as the diode sensitivity to various gases. It is concluded that the ability of SiC to operate as a high temperature semiconductor significantly enhances the versatility of the Schottky diode gas sensing structure and will potentially allow the fabrication of a SiC-based gas sensor arrays for versatile high temperature gas sensing applications.

  5. Electromechanical resistive switching via back-to-back Schottky junctions

    NASA Astrophysics Data System (ADS)

    Li, Lijie

    2015-09-01

    The physics of the electromechanical resistive switching is uncovered using the theory of back-to-back Schottky junctions combined with the quantum domain space charge transport. A theoretical model of the basic element of resistive switching devices realized by the metal-ZnO nanowires-metal structure has been created and analyzed. Simulation results show that the reverse biased Schottky junction and the air gap impedance dominate the current-voltage relation at higher external voltages; thereby electromechanically varying the air gap thickness causes the device exhibit resistive tuning characteristics. As the device dimension is in nanometre scale, investigation of the model based on quantum mechanics has also been conducted.

  6. Carbon nanotube Schottky diodes using Ti-Schottky and Pt-ohmic contacts for high frequency applications

    NASA Technical Reports Server (NTRS)

    Manohara, Harish M.; Wong, Eric W.; Schlecht, Erich; Hunt, Brian D.; Siegel, Peter H.

    2005-01-01

    We have demonstrated Schottky diodes using semiconducting single-walled nanotubes (s-SWNTs) with titanium Schottky and platinum Ohmic contacts for high-frequency applications. The diodes are fabricated using angled evaporation of dissimilar metal contacts over an s-SWNT. The devices demonstrate rectifying behavior with large reverse bias breakdown voltages of greater than 15 V. To decrease the series resistance, multiple SWNTs are grown in parallel in a single device, and the metallic tubes are burnt-out selectively. At low biases these diodes showed ideality factors in the range of 1.5 to 1.9. Modeling of these diodes as direct detectors at room temperature at 2.5 terahertz (THz) frequency indicates noise equivalent powers (NEP) potentially comparable to that of the state-of-the-art gallium arsenide solid-state Schottky diodes, in the range of 10-13 W(square root)xHz.

  7. Carbon nanotube Schottky diodes using Ti-Schottky and Pt-Ohmic contacts for high frequency applications.

    PubMed

    Manohara, Harish M; Wong, Eric W; Schlecht, Erich; Hunt, Brian D; Siegel, Peter H

    2005-07-01

    We have demonstrated Schottky diodes using semiconducting single-walled nanotubes (s-SWNTs) with titanium Schottky and platinum Ohmic contacts for high-frequency applications. The diodes are fabricated using angled evaporation of dissimilar metal contacts over an s-SWNT. The devices demonstrate rectifying behavior with large reverse bias breakdown voltages of greater than -15 V. To decrease the series resistance, multiple SWNTs are grown in parallel in a single device, and the metallic tubes are burnt-out selectively. At low biases these diodes showed ideality factors in the range of 1.5 to 1.9. Modeling of these diodes as direct detectors at room temperature at 2.5 terahertz (THz) frequency indicates noise equivalent powers (NEP) potentially comparable to that of the state-of-the-art gallium arsenide solid-state Schottky diodes, in the range of 10(-13) W/ radical Hz.

  8. Carbon nanotube Schottky diodes using Ti-Schottky and Pt-ohmic contacts for high frequency applications

    NASA Technical Reports Server (NTRS)

    Manohara, Harish M.; Wong, Eric W.; Schlecht, Erich; Hunt, Brian D.; Siegel, Peter H.

    2005-01-01

    We have demonstrated Schottky diodes using semiconducting single-walled nanotubes (s-SWNTs) with titanium Schottky and platinum Ohmic contacts for high-frequency applications. The diodes are fabricated using angled evaporation of dissimilar metal contacts over an s-SWNT. The devices demonstrate rectifying behavior with large reverse bias breakdown voltages of greater than 15 V. To decrease the series resistance, multiple SWNTs are grown in parallel in a single device, and the metallic tubes are burnt-out selectively. At low biases these diodes showed ideality factors in the range of 1.5 to 1.9. Modeling of these diodes as direct detectors at room temperature at 2.5 terahertz (THz) frequency indicates noise equivalent powers (NEP) potentially comparable to that of the state-of-the-art gallium arsenide solid-state Schottky diodes, in the range of 10-13 W(square root)xHz.

  9. Contacts to GaAs, InP, and GaP for high-temperature and high-power applications

    NASA Astrophysics Data System (ADS)

    Lee, Paul P.; Hwu, R. Jennifer; Sadwick, Laurence P.; Kumar, B. R.; Chern, Jehn-Huar H.; Lin, C. H.; Balasubramaniam, H.

    1999-11-01

    There is a significant interest in the area of improving high temperature stable contacts to III-V semiconductors. Two attractive materials that offer promise in this area are dysprosium phosphide (DyP) and dysprosium arsenide (DyAs). This paper reports the electrical characterization of MBE- grown DyP and DyAs on GaAs, GaP, and InP substrates. The characterization methods include Hall and I-V measurements. DyP is lattice matched to GaAs, with a room temperature mismatch of less than 0.01% and is stable in air with no sign of oxidation, even after months of ambient exposure. DyP forms Schottky contacts to n-GaAs, n- and p-GaP, and p- InP with barrier heights of 0.81, 0.9, 0.8 and 0.74 eV, respectively. DyP on n-InP and p-GaAs is found to have ohmic behavior with the specific contact resistance of 1 X 10-4 and 2.9 X 10-5 (Omega) (DOT)cm2, respectively. DyAs also forms Schottky contacts to n-GaAs, p-InP and forms ohmic contacts to n-InP.

  10. A Generalized Theory of Electrical Characteristics of Schottky Barriers for Amorphous Materials

    NASA Astrophysics Data System (ADS)

    Gupta, H. M.

    1997-12-01

    In the present paper, we discuss a generalized theory of electrical characteristics for amorphous semiconductor (or insulator) Schottky barriers, considering: (i) surface states, (ii) doping impurity states at a single energy level and (iii) energetically distributed bulk impurity states. We also consider a thin oxide layer (10 Å) between metal and semiconductor. We develop current versus applied potential characteristics considering the variation of the Fermi level very close to contact inside the semiconductor and decrease in barrier height due to the image force effect as well as potential fall on the oxide layer. Finally, we discuss the importance of each parameter, i.e. surface states, distributed impurity states, doping impurity states, thickness of oxide layer etc. on the log I versus applied potential characteristics. The present theory is also applicable for intimate contact, i.e. metal-semiconductor contact, crystalline material structures or for Schottky barriers in insulators or polymers. Dans cet article nous proposons une théorie géneralisée pour les charactéristiques éléctriques de barrière Schottky en semiconducteurs amorphes (ou isolants), tout en considérant: (i) des états de surface, (ii) des états d'impuretés dopées dans un seul niveau d'énergie, (iii) des états d'impuretés massives distribuées en énergie. Nous considérons aussi une fine couche d'oxide (10 Å) entre le métal et le semiconducteur. Nous développons les charactéristiques du courrant versus potentiel appliquée tout en considérant des variations du niveau de Fermi très proche du contact à l'intérieur du semiconducteur et une décroissance de l'hauteur de la barrière dûe aux effects de la force d'image ainsi qu'au chute de potentiel dans la couche d'oxide. Finalement nous discutons l'importance de chaque paramètre, i.e. états de surface, états d'impuretés distribuées, états d'impuretés dopées, épaisseur de la couche d'oxide, etc. sur les charact

  11. Current transport mechanism in a metal-GaN nanowire Schottky diode.

    PubMed

    Lee, Seung-Yong; Lee, Sang-Kwon

    2007-12-12

    We investigated nano-Schottky diodes of gallium nitride nanowires with three Schottky metals (Cr, Ti, and Au) using current-voltage characteristics. All of the GaN nano-Schottky diodes showed a rectifying behavior. The abnormal electrical characteristics of a single GaN nanowire Schottky diode can be explained by a thermionic-field emission and an enhancement of the tunneling effects owing to both the relatively high concentration of the GaN nanowire itself and the nanoscale junction size of the GaN nanowire Schottky diodes.

  12. InGaAs Schottky barrier diode array detectors integrated with broadband antenna (Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Park, Dong Woo; Lee, Eui Su; Park, Jeong-Woo; Kim, Hyun-Soo; Lee, Il-Min; Park, Kyung Hyun

    2017-02-01

    Terahertz (THz) waves have been actively studied for the applications of astronomy, communications, analytical science and bio-technologies due to their low energy and high frequency. For example, THz systems can carry more information with faster rates than GHz systems. Besides, THz waves can be applied to imaging, sensing, and spectroscopy. Furthermore, THz waves can be used for non-destructive and non-harmful tomography of living objects. In this reasons, Schottky barrier diodes (SBD) have been widely used as a THz detector for their ultrafast carrier transport, high responsivity, high sensitivity, and excellent noise equivalent power. Furthermore, SBD detectors envisage developing THz applications at low cost, excellent capability, and high yield. Since the major concerns in the THz detectors for THz imaging systems are the realizations of the real-time image acquisitions via a reduced acquisition time, rather than the conventional raster scans that obtains an image by pixel-by-pixel acquisitions, a line-scan based systems utilizes an array detector with an 1 × n SBD array is preferable. In this study, we fabricated the InGaAs based SBD array detectors with broadband antennas of log-spiral and square-spiral patterns. To optimize leakage current and ideality factor, the dependence to the doping levels of ohmic and Schottky layers have been investigated. In addition, the dependence to the capacitance and resistance to anode size are also examined as well. As a consequence, the real-time THz imaging with our InGaAs SBD array detector have been successfully obtained.

  13. Growth of high-quality p-type GaAs epitaxial layers using carbon tetrabromide by gas source molecular-beam epitaxy and molecular-beam epitaxy

    SciTech Connect

    Houng, Y.M.; Lester, S.D.; Mars, D.E.

    1993-05-01

    Heavily C-doped p-type GaAs epitaxial films have been grown using carbon tetrabromide (CBr{sub 4}) as a dopant source in both gas source molecular-beam epitaxy (GSMBE) and molecular-beam epitaxy (MBE). It was found that CBr;{sub 4} has a great potential as a p-type dopant source for use in a conventional MBE chamber without any major modification of its pumping system because of its high-doping efficiency and low gas load. Hole concentrations in excess of 1x10{sup 20} cm{sup {minus}3} have been measured in CBr{sub 4}-doped GaAs grown from both the MBE or GSMBE techniques, using As{sub 4} or AsH{sub 3}, respectively. A Hall mobility of > 80 cm{sup 2}/V s was measured in layers with doping level of 5x10{sup 19} cm{sup {minus}3}, which is comparable to that from chemical beam exitaxially (CBE) grown TMGa-doped GaAs. Under GSMBE and MBE modes, the doping memory effect in AlGaAs was greatly reduced using CBr{sub 4} as compared to TMGa doping source. GSMBE grown heterojunction bipolar transistors with a CBr{sub 4} as compared to TMGa doping source. GSMBE grown heterojunction bipolar transistors with a CBr{sub 4}-doped base layer have a current gain as high as 79 and a base sheet resistance as low as 225 {Omega}/{open_square}. 15 refs., 4 figs., 1 tab.

  14. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1979-01-01

    The optimization of space processing of GaAs is described. The detailed compositional, structural, and electronic characterization of GaAs on a macro- and microscale and the relationships between growth parameters and the properties of GaAs are among the factors discussed. The key parameters limiting device performance are assessed.

  15. Controllable Schottky Barriers between MoS2 and Permalloy

    PubMed Central

    Wang, Weiyi; Liu, Yanwen; Tang, Lei; Jin, Yibo; Zhao, Tongtong; Xiu, Faxian

    2014-01-01

    MoS2 is a layered two-dimensional material with strong spin-orbit coupling and long spin lifetime, which is promising for electronic and spintronic applications. However, because of its large band gap and small electron affinity, a considerable Schottky barrier exists between MoS2 and contact metal, hindering the further study of spin transport and spin injection in MoS2. Although substantial progress has been made in improving device performance, the existence of metal-semiconductor Schottky barrier has not yet been fully understood. Here, we investigate permalloy (Py) contacts to both multilayer and monolayer MoS2. Ohmic contact is developed between multilayer MoS2 and Py electrodes with a negative Schottky barrier, which yields a high field-effect mobility exceeding 55 cm2V−1s−1 at low temperature. Further, by applying back gate voltage and inserting different thickness of Al2O3 layer between the metal and monolayer MoS2, we have achieved a good tunability of the Schottky barrier height (down to zero). These results are important in improving the performance of MoS2 transistor devices; and it may pave the way to realize spin transport and spin injection in MoS2. PMID:25370911

  16. Silicon Schottky photovoltaic diodes for solar energy conversion

    NASA Technical Reports Server (NTRS)

    Anderson, W. A.

    1975-01-01

    Various factors in Schottky barrier solar cell fabrication are evaluated in order to improve understanding of the current flow mechanism and to isolate processing variables that improve efficiency. Results of finger design, substrate resistivity, surface finishing and activation energy studies are detailed. An increased fill factor was obtained by baking of the vacuum system to remove moisture.

  17. Fast response of InSb Schottky detector.

    PubMed

    Kanno, Ikuo; Hishiki, Shigeomi; Kogetsu, Yoshitaka; Nakamura, Tatsuya; Katagiri, Masaki

    2007-05-01

    An InSb Schottky detector, fabricated from an undoped InSb wafer with Hall mobility which is higher than those of previously employed InSb wafers, was used for alpha particle detection. The output pulse of this InSb detector showed a very fast rise time, which was comparable with the output pulses of scintillation detectors.

  18. Above bandgap luminescence of p-type GaAs epitaxial layers

    NASA Astrophysics Data System (ADS)

    Sapriel, J.; Chavignon, J.; Alexandre, F.; Azoulay, R.; Sermage, B.; Rao, K.; Voos, M.

    1991-08-01

    New photoluminescence bands are observed in p-type GaAs epitaxial layers at 300 and 80 K, above the bandgap. These bands are independent of the nature of the dopant (Zn, Be, C) and of the growth technique (MBE or MOCVD). Their intensities increase as a function of the p doping (1 × 10 17 < p < 2 × 10 20cm-3) and peak at energies which correspond to transitions between the Γ 6, L 6 and X 6 minima of the conduction band and the Γ 8 and Γ 7 maxima of the valence band.

  19. Ultrafast properties of femtosecond-laser-ablated GaAs and its application to terahertz optoelectronics.

    PubMed

    Madéo, Julien; Margiolakis, Athanasios; Zhao, Zhen-Yu; Hale, Peter J; Man, Michael K L; Zhao, Quan-Zhong; Peng, Wei; Shi, Wang-Zhou; Dani, Keshav M

    2015-07-15

    We report on the first terahertz (THz) emitter based on femtosecond-laser-ablated gallium arsenide (GaAs), demonstrating a 65% enhancement in THz emission at high optical power compared to the nonablated device. Counter-intuitively, the ablated device shows significantly lower photocurrent and carrier mobility. We understand this behavior in terms of n-doping, shorter carrier lifetime, and enhanced photoabsorption arising from the ablation process. Our results show that laser ablation allows for efficient and cost-effective optoelectronic THz devices via the manipulation of fundamental properties of materials.

  20. Temperature and intensity dependence of photorefractive effect in GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Partovi, Afshin

    1986-01-01

    The photorefractive effect in semi-insulating Cr-doped GaAs as measured by the beam coupling technique was investigated as functions of temperature (295-386 K) and intensity (0.15-98 mW/sq cm of 1.15-micron light beams from a He-Ne laser). Results show that the photorefractive effect deteriorates rapidly over a narrow range of temperature as temperature rises, and that this characteristic temperature increases with the logarithm of beam intensity. The observed phenomenon is attributed to the competing effects of the dark- and light-induced conductivities.