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Sample records for electron-beam deposited ceria

  1. Laser assisted modification and chemical metallization of electron-beam deposited ceria thin films

    NASA Astrophysics Data System (ADS)

    Krumov, E.; Starbov, N.; Starbova, K.; Perea, A.; Solis, J.

    2009-11-01

    Excimer laser processing is applied for tailoring the surface morphology and phase composition of CeO 2 ceramic thin films. E-beam evaporation technique is used to deposit samples on stainless steel and silicate glass substrates. The films are then irradiated with ArF* excimer laser pulses under different exposure conditions. Scanning electron microscopy, optical spectrophotometry, X-ray diffractometry and EDS microanalysis are used to characterize the non-irradiated and laser-processed films. Upon UV laser exposure there is large increase of the surface roughness that is accompanied by photo-darkening and ceria reduction. It is shown that the laser induced changes in the CeO 2 films facilitate the deposition of metal nano-aggregates in a commercial copper electroless plating bath. The significance of laser modification as a novel approach for the production of CeO 2 based thin film catalysts is discussed.

  2. Tokomak disruption runaway electron beam energy deposition

    NASA Astrophysics Data System (ADS)

    Lei, Yian

    2012-10-01

    Disruption is one of the major concerns in magnetic confinement fusion (MCF) research. People believe the energetic runaway electron beam can damage the first wall by depositing most of its energy to certain region as heat, melting the wall. However, as the energy of the beam electron is very high (up to 50 MeV), most of the beam energy should be converted as gamma radiation and escape, and the fraction of thermal energy deposition is relatively small. We will calculate the runaway electron energy deposition in typical first wall configurations in ITER disruption scenario, and give the temperature profile of the wall. We will also calculate the bremsstrahlung gamma ray spectra of the beam and discuss the consequences.

  3. Focused electron beam induced deposition: A perspective

    PubMed Central

    Porrati, Fabrizio; Schwalb, Christian; Winhold, Marcel; Sachser, Roland; Dukic, Maja; Adams, Jonathan; Fantner, Georg

    2012-01-01

    Summary Background: Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is now particularly attractive for several areas in both, basic and applied research. The present topical review addresses selected examples that highlight this development in the areas of charge-transport regimes in nanogranular metals close to an insulator-to-metal transition, the use of these materials for strain- and magnetic-field sensing, and the prospect of extending FEBID to multicomponent systems, such as binary alloys and intermetallic compounds with cooperative ground states. Results: After a brief introduction to the technique, recent work concerning FEBID of Pt–Si alloys and (hard-magnetic) Co–Pt intermetallic compounds on the nanometer scale is reviewed. The growth process in the presence of two precursors, whose flux is independently controlled, is analyzed within a continuum model of FEBID that employs rate equations. Predictions are made for the tunability of the composition of the Co–Pt system by simply changing the dwell time of the electron beam during the writing process. The charge-transport regimes of nanogranular metals are reviewed next with a focus on recent theoretical advancements in the field. As a case study the transport properties of Pt–C nanogranular FEBID structures are discussed. It is shown that by means of a post-growth electron-irradiation treatment the electronic intergrain-coupling strength can be continuously tuned over a wide range. This provides unique access to the transport properties of this material close to the insulator-to-metal transition. In the last part of the review, recent developments in mechanical strain

  4. Patterned electrochemical deposition of copper using an electron beam

    SciTech Connect

    Heijer, Mark den; Shao, Ingrid; Reuter, Mark C.; Ross, Frances M.; Radisic, Alex

    2014-02-01

    We describe a technique for patterning clusters of metal using electrochemical deposition. By operating an electrochemical cell in the transmission electron microscope, we deposit Cu on Au under potentiostatic conditions. For acidified copper sulphate electrolytes, nucleation occurs uniformly over the electrode. However, when chloride ions are added there is a range of applied potentials over which nucleation occurs only in areas irradiated by the electron beam. By scanning the beam we control nucleation to form patterns of deposited copper. We discuss the mechanism for this effect in terms of electron beam-induced reactions with copper chloride, and consider possible applications.

  5. An investigation of nonuniform dose deposition from an electron beam

    NASA Astrophysics Data System (ADS)

    Lilley, William; Luu, Kieu X.

    1994-08-01

    In a search for an explanation of nonuniform electron-beam dose deposition, the integrated tiger series (ITS) of coupled electron/photon Monte Carlo transport codes was used to calculate energy deposition in the package materials of an application-specific integrated circuit (ASIC) while the thicknesses of some of the materials were varied. The thicknesses of three materials that were in the path of an electron-beam pulse were varied independently so that analysis could determine how the radiation dose measurements using thermoluminescent dosimeters (TLD's) would be affected. The three materials were chosen because they could vary during insertion of the die into the package or during the process of taking dose measurements. The materials were aluminum, HIPEC (a plastic), and silver epoxy. The calculations showed that with very small variations in thickness, the silver epoxy had a large effect on the dose uniformity over the area of the die.

  6. Electron Beam Freeform Fabrication: A Rapid Metal Deposition Process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. B.; Hafley, Robert A.

    2003-01-01

    Manufacturing of structural metal parts directly from computer aided design (CAD) data has been investigated by numerous researchers over the past decade. Researchers at NASA Langley REsearch Center are developing a new solid freeform fabrication process, electron beam freeform fabrication (EBF), as a rapid metal deposition process that works efficiently with a variety of weldable alloys. The EBF process introduces metal wire feedstock into a molten pool that is created and sustained using a focused electron beam in a vacuum environment. Thus far, this technique has been demonstrated on aluminum and titanium alloys of interest for aerospace structural applications nickel and ferrous based alloys are also planned. Deposits resulting from 2219 aluminum demonstrations have exhibited a range of grain morphologies depending upon the deposition parameters. These materials ave exhibited excellent tensile properties comparable to typical handbook data for wrought plate product after post-processing heat treatments. The EBF process is capable of bulk metal deposition at deposition rated in excess of 2500 cubic centimeters per hour (150 cubic inches per our) or finer detail at lower deposition rates, depending upon the desired application. This process offers the potential for rapidly adding structural details to simpler cast or forged structures rather than the conventional approach of machining large volumes of chips to produce a monolithic metallic structure. Selective addition of metal onto simpler blanks of material can have a significant effect on lead time reduction and lower material and machining costs.

  7. A critical literature review of focused electron beam induced deposition

    SciTech Connect

    Dorp, W. F. van; Hagen, C. W.

    2008-10-15

    An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied (current density, acceleration voltage, scan patterns, etc.). Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and (as far as possible) interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters (such as the local precursor pressure) are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally

  8. Focused electron beam induced deposition of pure SIO II

    NASA Astrophysics Data System (ADS)

    Perentes, Alexandre; Hoffmann, Patrik; Munnik, Frans

    2007-02-01

    Focused electron beam induced processing (FEBID) equipments are the "all in one" tools for high resolution investigation, and modification of nano-devices. Focused electron beam induced deposition from a gaseous precursor usually results in a nano-composite sub-structured material, in which the interesting material is embedded in an amorphous carbonaceous matrix. Using the Hydrogen free tetraisocyanatosilane Si(NCO) 4 molecule as Si source, we show how a controlled oxygen flux, simultaneously injected with the precursor vapors, causes contaminants to vanish from the FEB deposits obtained and leads to the deposition of pure SiO II. The chemical composition of the FEBID material could be controlled from SiC IINO 3 to SiO II, the latter containing undetectable foreign element contamination. The [O II] / [TICS] ratio needed to obtain SiO II in our FEB deposition equipment is larger than 300. The evolution of the FEBID material chemical composition is presented as function of the [O II] / [TICS] molecular flux ratios. A hypothetical decomposition pathway of this silane under these conditions is discussed based on the different species formed under electron bombardment of TICS. Transmission electron microscopy investigations demonstrated that the deposited oxide is smooth (roughness sub 2nm) and amorphous. Infrared spectroscopy confirmed the low concentration of hydroxyl groups. The Hydrogen content of the deposited oxide, measured by elastic recoil detection analysis, is as low as 1 at%. 193nm wavelength AIMS investigations of 125nm thick SiO II pads (obtained with [O II] / [TICS] = 325) showed an undetectable light absorption.

  9. Electron beam deposition for nanofabrication: Insights from surface science

    NASA Astrophysics Data System (ADS)

    Wnuk, J. D.; Rosenberg, S. G.; Gorham, J. M.; van Dorp, W. F.; Hagen, C. W.; Fairbrother, D. H.

    2011-02-01

    Electron beam induced deposition (EBID) is a direct-write lithographic technique that utilizes the dissociation of volatile precursors by a focused electron beam in a low vacuum environment to create nanostructures. Notable advantages of EBID over competing lithographic techniques are that it is a single step process that allows three-dimensional free-standing structures to be created, including features with single-nanometer scale dimensions. However, despite the inherent advantages of EBID, scientific and technological issues are impeding its development as an industrial nanofabrication tool. Perhaps the greatest single limitation of EBID is that metal-containing nanostructures deposited from organometallic precursors typically possess unacceptable levels of organic contamination which adversely affects the material's properties. In addition to the issue of purity, there is also a lack of understanding and quantitative information on the fundamental surface reactions and reaction cross-sections that are responsible for EBID. In this prospective, we describe how surface analytical techniques have begun to provide mechanistic and kinetic insights into the molecular level processes associated with EBID. This has been achieved by observing the effect of electron irradiation on nanometer thick films of organometallic precursors adsorbed onto solid substrates at low temperatures (< 200 K) under ultra-high vacuum conditions. Experimental observations include probing changes in surface composition, metal oxidation state, and the evolution of volatile species. Insights into surface reactions associated with purification strategies are also detailed. We also discuss unresolved scientific challenges and opportunities for future EBID research.

  10. Rapid tooling by electron-beam vapor deposition

    SciTech Connect

    Meier, T. C., LLNL

    1998-02-25

    Electron-beam physical vapor deposition (EBPVD) of tooling metal, onto a shaped substrate to produce a replica of the substrate surface, offers the potential for significant cost savings over present methods of injection mold manufacturing. These savings are realized by the high deposition rate and the corresponding short manufacturing times provided by the EBPVD process. However, on route to realizing these gains, there are process technical issues which need to be resolved. Mold surfaces typically contain relatively high aspect ratio details that must be replicated to dimensional tolerances within +/- 2 mils. The deposited mold material must also provide high surface hardness and high fracture toughness. Good quality grain structure can be obtained in deposited Al 10-wt% Cu mold material when the substrate and corresponding deposit are at high process temperature. However, the resulting mold is subject to distortion during cooldown due to differential temperatures and shrinkage rates. Thermally controlled cooldown and the use of crushable substrate materials reduce these distortions, but not to the required levels of tolerance. Deposition of the Al-Cu at lower temperature produces columnar, poorly joined grains which result in a brittle and weakened mold material. When Al 10-wt% Cu metal vapor is deposited across high aspect ratio step features on the substrate surface, a grain growth defect can form in the step-shadowed regions of the deposited material, alongside the step feature. The step coverage defect consists of entrained voids which persist at intermediate deposition temperatures and produce a weakened mold. This final 1997 LDRD report investigates causes of this step coverage defect and offers methods for their control and elimination.

  11. Fundamental Proximity Effects in Focused electron Beam Induced Deposition

    SciTech Connect

    Plank, Harald; Smith, Daryl; Haber, Thomas; Rack, Philip D; Hofer, Ferdinand

    2012-01-01

    Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the lateral electron straggle increased the volumetric growth rate by 250% by enhancing the effective forward scattered, backscattered, and secondary electron coefficients as well as by strong recollection effects of adjacent features; and (2) strategic patterning sequences are introduced to reduce precursor depletion effects which increase volumetric growth rates by more than 90%, demonstrating the strong influence of patterning parameters on the final performance of this powerful direct write technique.

  12. Superconducting nanowires by electron-beam-induced deposition

    SciTech Connect

    Sengupta, Shamashis; Li, Chuan; Guéron, S.; Bouchiat, H.; Baumier, Cedric; Fortuna, F.; Kasumov, Alik

    2015-01-26

    Superconducting nanowires can be fabricated by decomposition of an organometallic gas using a focused beam of Ga ions. However, physical damage and unintentional doping often result from the exposure to the ion beam, motivating the search for a means to achieve similar structures with a beam of electrons instead of ions. This has so far remained an experimental challenge. We report the fabrication of superconducting tungsten nanowires by electron-beam-induced-deposition, with critical temperature of 2.0 K and critical magnetic field of 3.7 T, and compare them with superconducting wires made with ions. This work is an important development for the template-free realization of nanoscale superconducting devices, without the requirement of an ion beam column.

  13. An Optimized Nanoparticle Separator Enabled by Electron Beam Induced Deposition

    SciTech Connect

    Fowlkes, Jason Davidson; Doktycz, Mitchel John; Rack, P. D.

    2010-01-01

    Size based separations technologies will inevitably benefit from advances in nanotechnology. Direct write nanofabrication provides a useful mechanism to deposit/etch nanoscale elements in environments otherwise inaccessible to conventional nanofabrication techniques. Here, electron beam induced deposition (EBID) was used to deposit an array of nanoscale features in a 3D environment with minimal material proximity effects outside the beam interaction region (BIR). Specifically, the membrane component of a nanoparticle separator was fabricated by depositing a linear array of sharply tipped nanopillars, with a singular pitch, designed for sub 50nm nanoparticle permeability. The nanopillar membrane was used in a dual capacity to control the flow of nanoparticles in the transaxial direction of the array while facilitating the sealing of the cellular sized compartment in the paraxial direction. An optimized growth recipe resulted which (1) maximized the growth efficiency of the membrane (which minimizes proximity effects), (2) preserved the fidelity of spacing between nanopillars (which maximizes the size based gating quality of the membrane) while (3) maintaining sharp nanopillar apexes for impaling an optically transparent polymeric lid critical for device sealing.

  14. Focused electron beam induced deposition of magnetic nanostructures

    NASA Astrophysics Data System (ADS)

    de Teresa, Jose M.

    2011-03-01

    Nanopatterning strategies of magnetic materials normally rely on standard techniques such as electron-beam lithography using electron-sensitive resists. Focused electron beam induced deposition (FEBID) is currently being investigated as an alternative single-step route to produce functional magnetic nanostructures. Thus, Co-based and Fe-based precursors have been recently investigated for the growth of magnetic nanostructures by FEBID. In the present contribution, I will give an overview of the existing literature on magnetic nanostructures by FEBID and I will focus on the growth of Co nanostructures by FEBID using Co 2 (CO)8 as precursor gas. The Co content in the nanostructures can reach 95%. Magnetotransport experiments indicate that full metallic behaviour is displayed with relatively low residual resistivity and standard anisotropic magnetoresistance (0.8%). The coercive field of nanowires with changing aspect ratio has been determined in nanowires with width down to 150 nm by means of Magneto-optical Kerr Effect and the magnetization reversal has been imaged by means of Magnetic Force Microscopy, Scanning Transmission X-ray Microscopy as well as Lorentz Microscopy experiments. Nano-Hall probes have been grown with remarkable minimum detectable magnetic flux. Noticeably, it has been found that the domain-wall propagation field is lower than the domain-wall nucleation field in L-shaped nanowires, with potential applications in magnetic logic, sensing and storage. The spin polarization of these Co nanodeposits has been determined through Andreev-Reflection experiments in ferromagnetic-superconducting nanocontacts and amounts to 35%. Recent results obtained in Fe-based nanostructures by FEBID using Fe 2 (CO)9 precursor will be also presented. I acknowledge the collaboration in this field with A. Fernandez-Pacheco, R. Cordoba, L. Serrano, S. Sangiao, L.A. Rodriguez, C. Magen, E. Snoeck, L. Morellon, M.R. Ibarra.

  15. Nanostructured component fabrication by electron beam-physical vapor deposition

    NASA Astrophysics Data System (ADS)

    Singh, Jogender; Wolfe, Douglas E.

    2005-08-01

    Fabrication of cost-effective, nano-grained net-shaped components has brought considerable interest to Department of Defense, National Aeronautics and Space Administration, and Department of Energy. The objective of this paper is to demonstrate the versatility of electron beam-physical vapor deposition (EB-PVD) technology in engineering new nanostructured materials with controlled microstructure and microchemistry in the form of coatings and net-shaped components for many applications including the space, turbine, optical, biomedical, and auto industries. Coatings are often applied on components to extent their performance and life under severe environmental conditions including thermal, corrosion, wear, and oxidation. Performance and properties of the coatings depend upon their composition, microstructure, and deposition condition. Simultaneous co-evaporation of multiple ingots of different compositions in the high energy EB-PVD chamber has brought considerable interest in the architecture of functional graded coatings, nano-laminated coatings, and design of new structural materials that could not be produced economically by conventional methods. In addition, high evaporation and condensate rates allowed fabricating precision net-shaped components with nanograined microstructure for various applications. Using EB-PVD, nano-grained rhenium (Re) coatings and net-shaped components with tailored microstructure and properties were fabricated in the form of tubes, plates, and Re-coated spherical graphite cores. This paper will also present the results of various metallic and ceramic coatings including chromium, titanium carbide (TiC), titanium diboride (TiB2), hafnium nitride (HfN), titanium-boron-carbonitride (TiBCN), and partially yttria stabilized zirconia (YSZ) TBC coatings deposited by EB-PVD for various applications.

  16. Use of beam deflection to control an electron beam wire deposition process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. (Inventor); Hofmeister, William H. (Inventor); Hafley, Robert A. (Inventor)

    2013-01-01

    A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.

  17. Optimization of a plasma focus device as an electron beam source for thin film deposition

    NASA Astrophysics Data System (ADS)

    Zhang, T.; Lin, J.; Patran, A.; Wong, D.; Hassan, S. M.; Mahmood, S.; White, T.; Tan, T. L.; Springham, S. V.; Lee, S.; Lee, P.; Rawat, R. S.

    2007-05-01

    Electron beam emission characteristics from neon, argon, hydrogen and helium in an NX2 dense plasma focus (DPF) device were investigated in order to optimize the plasma focus device for deposition of thin films using energetic electron beams. A Rogowski coil and CCD based magnetic spectrometer were used to obtain temporal characteristics, total electron charge and energy distributions of electron emission from the NX2 DPF device. It is found that hydrogen should be the first choice for thin film deposition as it produces the highest electron beam charge and higher energy (from 50 to 200 keV) electrons. Neon is the next best choice as it gives the next highest electron beam charge with mid-energy (from 30 to 70 keV) electrons. The operation of NX2 with helium at voltages above 12 kV produces a mid-energy (from 30 to 70 keV) electron beam with low-electron beam charge, however, argon is not a good electron beam source for our NX2 DPF device. Preliminary results of the first ever thin film deposition using plasma focus assisted pulsed electron deposition using a hydrogen operated NX2 plasma focus device are presented.

  18. Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

    NASA Astrophysics Data System (ADS)

    Noh, J. H.; Stanford, M. G.; Lewis, B. B.; Fowlkes, J. D.; Plank, H.; Rack, P. D.

    2014-12-01

    One critical area for the adoption of extreme ultraviolet (EUV) lithography is the development of appropriate mask repair strategies. To this end, we have explored focused electron beam-induced deposition of the ruthenium capping or protective layer. Electron beam-induced deposition (EBID) was used to deposit a ruthenium capping/protective film using the liquid bis(ethylcyclopentyldienyl)ruthenium(II) precursor. The carbon to ruthenium atomic ratio in the as-deposited material was estimated to be ~9/1. Subsequent to deposition, we demonstrate an electron stimulated purification process to remove carbon by-products from the deposit. Results indicate that high-fidelity nanoscale ruthenium repairs can be realized.

  19. Dielectric performance of diamond-like carbon nanofilms deposited by electron-beam-induced deposition

    NASA Astrophysics Data System (ADS)

    Balaur, Eugeniu; Peele, Andrew G.

    2008-12-01

    The effect of electron beam dose and low accelerating voltage on diamond-like-carbon (DLC) deposition rate and the resulting current-voltage characteristics in thin metal/DLC/semiconductor junctions was studied. We show that thicker DLC films can be obtained using lower accelerating voltages (2 kV) than when using higher accelerating voltage (20 kV). However, under the conditions used the insulating performance of the thicker films is worse than the thinner films. We attribute this effect to the variation of tunnelling barrier height in DLC deposited using different accelerating voltages. DLC films with a tunnelling barrier height of up to 3.12 eV were obtained using a 20 kV electron-beam, while only 0.73 eV was achieved for 2 kV DLC films.

  20. Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

    SciTech Connect

    Mackus, A. J. M.; Sanden, M. C. M. van de; Kessels, W. M. M.; Mulders, J. J. L.

    2010-06-15

    An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.

  1. Electrochemically Deposited Ceria Structures for Advanced Solid Oxide Fuel Cells

    NASA Astrophysics Data System (ADS)

    Brown, Evan C.

    As the pursuit towards emissions reduction intensifies with growing interest and nascent technologies, solid oxide fuel cells (SOFCs) remain an illustrious candidate for achieving our goals. Despite myriad advantages, SOFCs are still too costly for widespread deployment, even as unprecedented materials developments have recently emerged. This suggests that, in addition to informed materials selection, the necessary power output--and, thereby, cost-savings--gains must come from the fuel cell architecture. The work presented in this manuscript primarily investigates cathodic electrochemical deposition (CELD) as a scalable micro-/nanoscale fabrication tool for engineering ceria-based components in a SOFC assembly. Also, polymer sphere lithography was utilized to deposit fully connected, yet fully porous anti-dot metal films on yttira-stabilized zirconia (YSZ) with specific and knowable geometries, useful for mechanistic studies. Particular attention was given to anode structures, for which anti-dot metal films on YSZ served as composite substrates for subsequent CELD of doped ceria. By tuning the applied potential, a wide range of microstructures from high surface area coatings to planar, thin films was possible. In addition, definitive deposition was shown to occur on the electronically insulating YSZ surfaces, producing quality YSZ|ceria interfaces. These CELD ceria deposits exhibited promising electrochemical activity, as probed by A.C. Impedance Spectroscopy. In an effort to extend its usefulness as a SOFC fabrication tool, the CELD of ceria directly onto common SOFC cathode materials without a metallic phase was developed, as well as templated deposition schemes producing ceria nanowires and inverse opals.

  2. Thermal imaging for assessment of electron-beam freeform fabrication (EBF3) additive manufacturing deposits

    NASA Astrophysics Data System (ADS)

    Zalameda, Joseph N.; Burke, Eric R.; Hafley, Robert A.; Taminger, Karen M.; Domack, Christopher S.; Brewer, Amy; Martin, Richard E.

    2013-05-01

    Additive manufacturing is a rapidly growing field where 3-dimensional parts can be produced layer by layer. NASA's electron beam freeform fabrication (EBF3) technology is being evaluated to manufacture metallic parts in a space environment. The benefits of EBF3 technology are weight savings to support space missions, rapid prototyping in a zero gravity environment, and improved vehicle readiness. The EBF3 system is composed of 3 main components: electron beam gun, multi-axis position system, and metallic wire feeder. The electron beam is used to melt the wire and the multi-axis positioning system is used to build the part layer by layer. To insure a quality deposit, a near infrared (NIR) camera is used to image the melt pool and solidification areas. This paper describes the calibration and application of a NIR camera for temperature measurement. In addition, image processing techniques are presented for deposit assessment metrics.

  3. Simulation of electron transport during electron-beam-induced deposition of nanostructures

    PubMed Central

    Jeschke, Harald O; Valentí, Roser

    2013-01-01

    Summary We present a numerical investigation of energy and charge distributions during electron-beam-induced growth of tungsten nanostructures on SiO2 substrates by using a Monte Carlo simulation of the electron transport. This study gives a quantitative insight into the deposition of energy and charge in the substrate and in the already existing metallic nanostructures in the presence of the electron beam. We analyze electron trajectories, inelastic mean free paths, and the distribution of backscattered electrons in different compositions and at different depths of the deposit. We find that, while in the early stages of the nanostructure growth a significant fraction of electron trajectories still interacts with the substrate, when the nanostructure becomes thicker the transport takes place almost exclusively in the nanostructure. In particular, a larger deposit density leads to enhanced electron backscattering. This work shows how mesoscopic radiation-transport techniques can contribute to a model that addresses the multi-scale nature of the electron-beam-induced deposition (EBID) process. Furthermore, similar simulations can help to understand the role that is played by backscattered electrons and emitted secondary electrons in the change of structural properties of nanostructured materials during post-growth electron-beam treatments. PMID:24367747

  4. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    PubMed Central

    Lewis, Brett B; Stanford, Michael G; Fowlkes, Jason D; Lester, Kevin; Plank, Harald

    2015-01-01

    Summary Platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. In addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention. PMID:25977862

  5. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    SciTech Connect

    Lewis, Brett B.; Stanford, Michael G.; Fowlkes, Jason D.; Lester, Kevin; Plank, Harald; Rack, Philip D.

    2015-04-08

    In this paper, platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. Finally, in addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.

  6. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

    DOE PAGESBeta

    Lewis, Brett B.; Stanford, Michael G.; Fowlkes, Jason D.; Lester, Kevin; Plank, Harald; Rack, Philip D.

    2015-04-08

    In this paper, platinum–carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top–down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. Finally, in addition to purification, the post-deposition electron stimulated oxygen purification process enhancesmore » the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.« less

  7. Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition.

    PubMed

    Lewis, Brett B; Stanford, Michael G; Fowlkes, Jason D; Lester, Kevin; Plank, Harald; Rack, Philip D

    2015-01-01

    Platinum-carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top-down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. In addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.

  8. Electron-beam induced deposition and autocatalytic decomposition of Co(CO)3NO

    PubMed Central

    Vollnhals, Florian; Drost, Martin; Tu, Fan; Carrasco, Esther; Späth, Andreas; Fink, Rainer H; Steinrück, Hans-Peter

    2014-01-01

    Summary The autocatalytic growth of arbitrarily shaped nanostructures fabricated by electron beam-induced deposition (EBID) and electron beam-induced surface activation (EBISA) is studied for two precursors: iron pentacarbonyl, Fe(CO)5, and cobalt tricarbonyl nitrosyl, Co(CO)3NO. Different deposits are prepared on silicon nitride membranes and silicon wafers under ultrahigh vacuum conditions, and are studied by scanning electron microscopy (SEM) and scanning transmission X-ray microscopy (STXM), including near edge X-ray absorption fine structure (NEXAFS) spectroscopy. It has previously been shown that Fe(CO)5 decomposes autocatalytically on Fe seed layers (EBID) and on certain electron beam-activated surfaces, yielding high purity, polycrystalline Fe nanostructures. In this contribution, we investigate the growth of structures from Co(CO)3NO and compare it to results obtained from Fe(CO)5. Co(CO)3NO exhibits autocatalytic growth on Co-containing seed layers prepared by EBID using the same precursor. The growth yields granular, oxygen-, carbon- and nitrogen-containing deposits. In contrast to Fe(CO)5 no decomposition on electron beam-activated surfaces is observed. In addition, we show that the autocatalytic growth of nanostructures from Co(CO)3NO can also be initiated by an Fe seed layer, which presents a novel approach to the fabrication of layered nanostructures. PMID:25161851

  9. Electron-beam induced deposition and autocatalytic decomposition of Co(CO)3NO.

    PubMed

    Vollnhals, Florian; Drost, Martin; Tu, Fan; Carrasco, Esther; Späth, Andreas; Fink, Rainer H; Steinrück, Hans-Peter; Marbach, Hubertus

    2014-01-01

    The autocatalytic growth of arbitrarily shaped nanostructures fabricated by electron beam-induced deposition (EBID) and electron beam-induced surface activation (EBISA) is studied for two precursors: iron pentacarbonyl, Fe(CO)5, and cobalt tricarbonyl nitrosyl, Co(CO)3NO. Different deposits are prepared on silicon nitride membranes and silicon wafers under ultrahigh vacuum conditions, and are studied by scanning electron microscopy (SEM) and scanning transmission X-ray microscopy (STXM), including near edge X-ray absorption fine structure (NEXAFS) spectroscopy. It has previously been shown that Fe(CO)5 decomposes autocatalytically on Fe seed layers (EBID) and on certain electron beam-activated surfaces, yielding high purity, polycrystalline Fe nanostructures. In this contribution, we investigate the growth of structures from Co(CO)3NO and compare it to results obtained from Fe(CO)5. Co(CO)3NO exhibits autocatalytic growth on Co-containing seed layers prepared by EBID using the same precursor. The growth yields granular, oxygen-, carbon- and nitrogen-containing deposits. In contrast to Fe(CO)5 no decomposition on electron beam-activated surfaces is observed. In addition, we show that the autocatalytic growth of nanostructures from Co(CO)3NO can also be initiated by an Fe seed layer, which presents a novel approach to the fabrication of layered nanostructures.

  10. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    SciTech Connect

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Rack, Philip D.

    2015-06-30

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar–H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.

  11. Inert gas enhanced laser-assisted purification of platinum electron-beam-induced deposits

    DOE PAGESBeta

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Rack, Philip D.

    2015-06-30

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar–H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some lossmore » of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. Lastly, a sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.« less

  12. Inert Gas Enhanced Laser-Assisted Purification of Platinum Electron-Beam-Induced Deposits.

    PubMed

    Stanford, Michael G; Lewis, Brett B; Noh, Joo Hyon; Fowlkes, Jason D; Rack, Philip D

    2015-09-01

    Electron-beam-induced deposition patterns, with composition of PtC5, were purified using a pulsed laser-induced purification reaction to erode the amorphous carbon matrix and form pure platinum deposits. Enhanced mobility of residual H2O molecules via a localized injection of inert Ar-H2 (4%) is attributed to be the reactive gas species for purification of the deposits. Surface purification of deposits was realized at laser exposure times as low as 0.1 s. The ex situ purification reaction in the deposit interior was shown to be rate-limited by reactive gas diffusion into the deposit, and deposit contraction associated with the purification process caused some loss of shape retention. To circumvent the intrinsic flaws of the ex situ anneal process, in situ deposition and purification techniques were explored that resemble a direct write atomic layer deposition (ALD) process. First, we explored a laser-assisted electron-beam-induced deposition (LAEBID) process augmented with reactive gas that resulted in a 75% carbon reduction compared to standard EBID. A sequential deposition plus purification process was also developed and resulted in deposition of pure platinum deposits with high fidelity and shape retention.

  13. Electrical characterization of defects introduced in n-Ge during electron beam deposition or exposure

    SciTech Connect

    Coelho, S. M. M.; Auret, F. D.; Janse van Rensburg, P. J.; Nel, J. M.

    2013-11-07

    Schottky barrier diodes prepared by electron beam deposition (EBD) on Sb-doped n-type Ge were characterized using deep level transient spectroscopy (DLTS). Pt EBD diodes manufactured with forming gas in the chamber had two defects, E{sub 0.28} and E{sub 0.31}, which were not previously observed after EBD. By shielding the samples mechanically during EBD, superior diodes were produced with no measureable deep levels, establishing that energetic ions created in the electron beam path were responsible for the majority of defects observed in the unshielded sample. Ge samples that were first exposed to the conditions of EBD, without metal deposition (called electron beam exposure herein), introduced a number of new defects not seen after EBD with only the E-center being common to both processes. Substantial differences were noted when these DLTS spectra were compared to those obtained using diodes irradiated by MeV electrons or alpha particles indicating that very different defect creation mechanisms are at play when too little energy is available to form Frenkel pairs. These observations suggest that when EBD ions and energetic particles collide with the sample surface, inducing intrinsic non-localised lattice excitations, they modify defects deeper in the semiconductor thus rendering them observable.

  14. Review of magnetic nanostructures grown by focused electron beam induced deposition (FEBID)

    NASA Astrophysics Data System (ADS)

    De Teresa, J. M.; Fernández-Pacheco, A.; Córdoba, R.; Serrano-Ramón, L.; Sangiao, S.; Ibarra, M. R.

    2016-06-01

    We review the current status of the use of focused electron beam induced deposition (FEBID) for the growth of magnetic nanostructures. This technique relies on the local dissociation of a precursor gas by means of an electron beam. The most promising results have been obtained using the Co2(CO)8 precursor, where the Co content in the grown nanodeposited material can be tailored up to more than 95 at.%. Functional behaviour of these Co nanodeposits has been observed in applications such as arrays of magnetic dots for information storage and catalytic growth, magnetic tips for scanning probe microscopes, nano-Hall sensors for bead detection, nano-actuated magnetomechanical systems and nanowires for domain-wall manipulation. The review also covers interesting results observed in Fe-based and alloyed nanodeposits. Advantages and disadvantages of FEBID for the growth of magnetic nanostructures are discussed in the article as well as possible future directions in this field.

  15. Role of activated chemisorption in gas-mediated electron beam induced deposition.

    PubMed

    Bishop, James; Lobo, Charlene J; Martin, Aiden; Ford, Mike; Phillips, Matthew; Toth, Milos

    2012-10-01

    Models of adsorbate dissociation by energetic electrons are generalized to account for activated sticking and chemisorption, and used to simulate the rate kinetics of electron beam induced chemical vapor deposition (EBID). The model predicts a novel temperature dependence caused by thermal transitions from physisorbed to chemisorbed states that govern adsorbate coverage and EBID rates at elevated temperatures. We verify these results by experiments that also show how EBID can be used to deposit high purity materials and characterize the rates and energy barriers that govern adsorption.

  16. Texture-Induced Anisotropy in an Inconel 718 Alloy Deposited Using Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Tayon, W.; Shenoy, R.; Bird, R.; Hafley, R.; Redding, M.

    2014-01-01

    A test block of Inconel (IN) 718 was fabricated using electron beam freeform fabrication (EBF(sup 3)) to examine how the EBF(sup 3) deposition process affects the microstructure, crystallographic texture, and mechanical properties of IN 718. Tests revealed significant anisotropy in the elastic modulus for the as-deposited IN 718. Subsequent tests were conducted on specimens subjected to a heat treatment designed to decrease the level of anisotropy. Electron backscatter diffraction (EBSD) was used to characterize crystallographic texture in the as-deposited and heat treated conditions. The anisotropy in the as-deposited condition was strongly affected by texture as evidenced by its dependence on orientation relative to the deposition direction. Heat treatment resulted in a significant improvement in modulus of the EBF(sup 3) product to a level nearly equivalent to that for wrought IN 718 with reduced anisotropy; reduction in texture through recrystallization; and production of a more homogeneous microstructure.

  17. Electron flux controlled switching between electron beam induced etching and deposition

    NASA Astrophysics Data System (ADS)

    Toth, Milos; Lobo, Charlene J.; Hartigan, Gavin; Ralph Knowles, W.

    2007-03-01

    Electron beam induced deposition (EBID) and etching (EBIE) are promising methods for the fabrication of three-dimensional nanodevices, wiring of nanostructures, and repair of photolithographic masks. Here, we study simultaneous EBID and EBIE, and demonstrate an athermal electron flux controlled transition between material deposition and etching. The switching is observed when one of the processes has both a higher efficiency and a lower precursor partial pressure than the other. This is demonstrated in two technologically important systems: during XeF2-mediated etching of chrome on a photolithographic mask and during deposition and etching of carbonaceous films on a semiconductor surface. Simultaneous EBID and EBIE can be used to enhance the spatial localization of etch profiles. It plays a key role in reducing contamination buildup rates during low vacuum electron imaging and deposition of high purity nanostructures in the presence of oxygen-containing gases.

  18. Site control technique for quantum dots using electron beam induced deposition

    SciTech Connect

    Iizuka, Kanji; Jung, JaeHun; Yokota, Hiroshi

    2014-05-15

    To develop simple and high throughput sit definition technique for quantum dots (QDs), the electron beam induced deposition (EBID) method was used as desorption guide of phosphorus atoms form InP substrate. As the results one or a few indium (In) droplets (DLs) were created in the carbon grid pattern by thermal annealing at a temperature of 450°C for 10 min in the ultra high vacuum condition. The size of In DLs was larger than QDs, but arsenide DLs by molecular beam in growth chamber emitted wavelength of 1.028μm at 50K by photoluminescence measurement.

  19. Direct-write deposition and focused-electron-beam-induced purification of gold nanostructures.

    PubMed

    Belić, Domagoj; Shawrav, Mostafa M; Gavagnin, Marco; Stöger-Pollach, Michael; Wanzenboeck, Heinz D; Bertagnolli, Emmerich

    2015-02-01

    Three-dimensional gold (Au) nanostructures offer promise in nanoplasmonics, biomedical applications, electrochemical sensing and as contacts for carbon-based electronics. Direct-write techniques such as focused-electron-beam-induced deposition (FEBID) can provide such precisely patterned nanostructures. Unfortunately, FEBID Au traditionally suffers from a high nonmetallic content and cannot meet the purity requirements for these applications. Here we report exceptionally pure pristine FEBID Au nanostructures comprising submicrometer-large monocrystalline Au sections. On the basis of high-resolution transmission electron microscopy results and Monte Carlo simulations of electron trajectories in the deposited nanostructures, we propose a curing mechanism that elucidates the observed phenomena. The in situ focused-electron-beam-induced curing mechanism was supported by postdeposition ex situ curing and, in combination with oxygen plasma cleaning, is utilized as a straightforward purification method for planar FEBID structures. This work paves the way for the application of FEBID Au nanostructures in a new generation of biosensors and plasmonic nanodevices.

  20. Highly conductive and pure gold nanostructures grown by electron beam induced deposition

    PubMed Central

    Shawrav, Mostafa M.; Taus, Philipp; Wanzenboeck, Heinz D.; Schinnerl, M.; Stöger-Pollach, M.; Schwarz, S.; Steiger-Thirsfeld, A.; Bertagnolli, Emmerich

    2016-01-01

    This work introduces an additive direct-write nanofabrication technique for producing extremely conductive gold nanostructures from a commercial metalorganic precursor. Gold content of 91 atomic % (at. %) was achieved by using water as an oxidative enhancer during direct-write deposition. A model was developed based on the deposition rate and the chemical composition, and it explains the surface processes that lead to the increases in gold purity and deposition yield. Co-injection of an oxidative enhancer enabled Focused Electron Beam Induced Deposition (FEBID)—a maskless, resistless deposition method for three dimensional (3D) nanostructures—to directly yield pure gold in a single process step, without post-deposition purification. Gold nanowires displayed resistivity down to 8.8 μΩ cm. This is the highest conductivity achieved so far from FEBID and it opens the possibility of applications in nanoelectronics, such as direct-write contacts to nanomaterials. The increased gold deposition yield and the ultralow carbon level will facilitate future applications such as the fabrication of 3D nanostructures in nanoplasmonics and biomolecule immobilization. PMID:27666531

  1. Study And Comparison Of Silver Mirrors Deposited On Different Substrates By Electron-Beam Gun Method

    SciTech Connect

    Asl, Jahanbakhsh Mashaiekhy; Shafieizadeh, Zahra; Sabbaghzadeh, Jamshid; Anaraki, Mahdi

    2010-12-23

    Choosing the right substrate is one of the important factors for improving quality parameters of thin films such as adhesion between layers and substrates. The selected substrate should have proper physical and chemical compatibility with deposited thin film. In this paper, we have been investigated four different types of high reflective laser mirrors that were produced in similar conditions on four different kinds of substrates including copper, stainless steel, brass, and nickel. We used electron-beam gun method for deposition of silver layers. At the end we compared theoretical results with practical results that were yielded by laser damage threshold test. It was shown that brass is the best choice for silver metal mirrors as a substrate.

  2. Electrical transport and breakdown in graphene multilayers loaded with electron beam induced deposited platinum.

    PubMed

    Kulshrestha, Neha; Misra, Abhishek; Koratkar, Nikhil; Misra, D S

    2013-04-24

    We demonstrate here the effect of electron beam induced deposited platinum on the electrical transport through multilayer graphene sheets. Platinum metal is deposited at different positions on the graphene multilayers, i.e., including as well as excluding the bottom contact sites and the change in electrical conductance of the same multilayer graphene sheets before and after platinum deposition is segregated. An improvement in electrical conductance is observed even if the metal is deposited at the part of the graphene sheets that does not touch the bottom gold electrodes, and hence this experimental approach directly demonstrates that the contact improvement is not the sole reason for the improved electrical conduction. The improvement in electrical performance of the graphene sheets is explained in terms of the doping of graphene sheets caused by the charge transfer between the deposited metal and the graphene and thereby modified density of states for electrical conduction. Metal deposition also leads to the increased interlayer interaction of the graphene sheets as revealed by the transmission electron microscopy analysis. Further, two types of breakdown behaviors viz. sharp and stepped breakdowns observed for these graphene devices are explained in terms of the effective graphene-metal contact area. These studies reveal the implications of top metal contact fabrication on graphene for electronic devices.

  3. Closed-Loop Process Control for Electron Beam Freeform Fabrication and Deposition Processes

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. (Inventor); Hafley, Robert A. (Inventor); Martin, Richard E. (Inventor); Hofmeister, William H. (Inventor)

    2013-01-01

    A closed-loop control method for an electron beam freeform fabrication (EBF(sup 3)) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF(sup 3) process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF(sup 3) apparatus to control the EBF(sup 3) process in a closed-loop manner.

  4. REFLEX: An energy deposition code that models the effects of electron reflection during electron beam heating tests

    SciTech Connect

    Stone, C.A. IV; Croessmann, C.D.; Whitley, J.B.

    1988-01-01

    This report describes an energy coupling model that considers electron reflection losses during electron beam heating experiments. This model is embodied on the REFLEX computer code, written in standard FORTRAN 77. REFLEX currently models energy deposition phenomena in three different sample geometries. These configurations include flat, cylindrical shell, and hemispherical shell surfaces. Given the electron beam operating parameters, REFLEX calculates the heat flux profile over a sample's surface, the total amount of energy deposited into a sample, and the percentage of the electron beam energy that is transferred to a sample. This document describes the energy deposition equations used in the REFLEX code; the program is described and detailed instructions are given regarding the input. Results are given for each geometry and possible experimental applications are presented. 3 refs., 20 figs., 11 tabs.

  5. REFLEX: An energy deposition code that models the effects of electron reflection during electron beam heating tests

    NASA Astrophysics Data System (ADS)

    Stone, C. A., IV; Croessmann, C. D.; Whitley, J. B.

    1988-01-01

    This report describes an energy coupling model that considers electron reflection losses during electron beam heating experiments. This model is embodied on the REFLEX computer code, written in standard FORTRAN 77. REFLEX currently models energy deposition phenomena in three different sample geometries. These configurations include flat, cylindrical shell, and hemispherical shell surfaces. Given the electron beam operating parameters, REFLEX calculates the heat flux profile over a sample's surface, the total amount of energy deposited into a sample, and the percentage of the electron beam energy that is transferred to a sample. This document describes the energy deposition equations used in the REFLEX code; the program is described and detailed instructions are given regarding the input. Results are given for each geometry and possible experimental applications are presented.

  6. Focused-electron-beam-induced-deposited cobalt nanopillars for nanomagnetic logic

    NASA Astrophysics Data System (ADS)

    Sharma, N.; van Mourik, R. A.; Yin, Y.; Koopmans, B.; Parkin, S. S. P.

    2016-04-01

    Nanomagnetic logic (NML) intends to alleviate problems of continued miniaturization of CMOS-based electronics, such as energy dissipation through heat, through advantages such as low power operation and non-volatile magnetic elements. In line with recent breakthroughs in NML with perpendicularly magnetized elements formed from thin films, we have fabricated NML inverter chains from Co nanopillars by focused electron beam induced deposition (FEBID) that exhibit shape-induced perpendicular magnetization. The flexibility of FEBID allows optimization of NML structures. Simulations reveal that the choice of nanopillar dimensions is critical to obtain the correct antiferromagnetically coupled configuration. Experiments carrying the array through a clocking cycle using the Oersted field from an integrated Cu wire show that the array responds to the clocking cycle.

  7. Surface excitations in the modelling of electron transport for electron-beam-induced deposition experiments

    PubMed Central

    Valentí, Roser; Werner, Wolfgang S

    2015-01-01

    Summary The aim of the present overview article is to raise awareness of an essential aspect that is usually not accounted for in the modelling of electron transport for focused-electron-beam-induced deposition (FEBID) of nanostructures: Surface excitations are on the one hand responsible for a sizeable fraction of the intensity in reflection-electron-energy-loss spectra for primary electron energies of up to a few kiloelectronvolts and, on the other hand, they play a key role in the emission of secondary electrons from solids, regardless of the primary energy. In this overview work we present a general perspective of recent works on the subject of surface excitations and on low-energy electron transport, highlighting the most relevant aspects for the modelling of electron transport in FEBID simulations. PMID:26171301

  8. Focused-electron-beam-induced-deposited cobalt nanopillars for nanomagnetic logic.

    PubMed

    Sharma, N; van Mourik, R A; Yin, Y; Koopmans, B; Parkin, S S P

    2016-04-22

    Nanomagnetic logic (NML) intends to alleviate problems of continued miniaturization of CMOS-based electronics, such as energy dissipation through heat, through advantages such as low power operation and non-volatile magnetic elements. In line with recent breakthroughs in NML with perpendicularly magnetized elements formed from thin films, we have fabricated NML inverter chains from Co nanopillars by focused electron beam induced deposition (FEBID) that exhibit shape-induced perpendicular magnetization. The flexibility of FEBID allows optimization of NML structures. Simulations reveal that the choice of nanopillar dimensions is critical to obtain the correct antiferromagnetically coupled configuration. Experiments carrying the array through a clocking cycle using the Oersted field from an integrated Cu wire show that the array responds to the clocking cycle. PMID:26941232

  9. Thermal Conductivity Measurement of an Electron-Beam Physical-Vapor-Deposition Coating

    PubMed Central

    Slifka, A. J.; Filla, B. J.

    2003-01-01

    An industrial ceramic thermal-barrier coating designated PWA 266, processed by electron-beam physical-vapor deposition, was measured using a steady-state thermal conductivity technique. The thermal conductivity of the mass fraction 7 % yttria-stabilized zirconia coating was measured from 100 °C to 900 °C. Measurements on three thicknesses of coatings, 170 μm, 350 μm, and 510 μm resulted in thermal conductivity in the range from 1.5 W/(m·K) to 1.7 W/(m·K) with a combined relative standard uncertainty of 20 %. The thermal conductivity is not significantly dependent on temperature. PMID:27413601

  10. Electron beam physical vapor deposition of thin ruby films for remote temperature sensing

    NASA Astrophysics Data System (ADS)

    Li, Wei; Coppens, Zachary J.; Greg Walker, D.; Valentine, Jason G.

    2013-04-01

    Thermographic phosphors (TGPs) possessing temperature-dependent photoluminescence properties have a wide range of uses in thermometry due to their remote access and large temperature sensitivity range. However, in most cases, phosphors are synthesized in powder form, which prevents their use in high resolution micro and nanoscale thermal microscopy. In the present study, we investigate the use of electron beam physical vapor deposition to fabricate thin films of chromium-doped aluminum oxide (Cr-Al2O3, ruby) thermographic phosphors. Although as-deposited films were amorphous and exhibited weak photoluminescence, the films regained the stoichiometry and α-Al2O3 crystal structure of the combustion synthesized source powder after thermal annealing. As a consequence, the annealed films exhibit both strong photoluminescence and a temperature-dependent lifetime that decreases from 2.9 ms at 298 K to 2.1 ms at 370 K. Ruby films were also deposited on multiple substrates. To ensure a continuous film with smooth surface morphology and strong photoluminescence, we use a sapphire substrate, which is thermal expansion coefficient and lattice matched to the film. These thin ruby films can potentially be used as remote temperature sensors for probing the local temperatures of micro and nanoscale structures.

  11. Magnetization reversal in individual cobalt micro- and nanowires grown by focused-electron-beam-induced-deposition.

    PubMed

    Fernández-Pacheco, A; De Teresa, J M; Szkudlarek, A; Córdoba, R; Ibarra, M R; Petit, D; O'Brien, L; Zeng, H T; Lewis, E R; Read, D E; Cowburn, R P

    2009-11-25

    We systematically study individual micro- and nanometric polycrystalline cobalt wires grown by focused-electron-beam-induced-deposition. The deposits were grown in a range of aspect ratios varying from 1 up to 26. The minimum lateral dimension of the nanowires was 150 nm, for a thickness of 40 nm. Atomic force microscopy images show beam-current-dependent profiles, associated with different regimes of deposition. The magnetization reversal of individual nanowires is studied by means of the spatially resolved magneto-optical Kerr effect. Abrupt switching is observed, with a systematic dependence on the wire's dimensions. This dependence of the coercive field is understood in magnetostatic terms, and agrees well with previous results on cobalt wires grown with different techniques. The influence of compositional gradients along the structural profile on the magnetic reversal is studied by using micromagnetic simulations. This work demonstrates the feasibility of using this technique to fabricate highly pure magnetic nanostructures, and highlights the advantages and disadvantages of the technique with respect to more conventional ones.

  12. Lung deposition and extrapulmonary translocation of nano-ceria after intratracheal instillation

    NASA Astrophysics Data System (ADS)

    He, Xiao; Zhang, Haifeng; Ma, Yuhui; Bai, Wei; Zhang, Zhiyong; Lu, Kai; Ding, Yayun; Zhao, Yuliang; Chai, Zhifang

    2010-07-01

    The broad potential applications of manufactured nanomaterials call for urgent assessment of their environmental and biological safety. However, most of the previous work focused on the cell level performance; little was known about the consequences of nanomaterial exposure at the whole-body and organ levels. In the present paper, the radiotracer technique was employed to study the pulmonary deposition and the translocation to secondary target organs after ceria nanoparticles (nano-ceria) were intratracheally instilled into Wistar rats. It was found that 63.9 ± 8.2% of the instilled nano-ceria remained in the lung by 28 d postexposure and the elimination half-life was 103 d. At the end of the test period, only 1/8-1/3 of the daily elimination of nano-ceria from the lung was cleared via the gastrointestinal tract, suggesting that phagocytosis by alveolar macrophages (AMs) with subsequent removal towards the larynx was no longer the predominant route for the elimination of nano-ceria from the lung. The whole-body redistribution of nano-ceria demonstrated that the deposited nano-ceria could penetrate through the alveolar wall into the systemic circulation and accumulate in the extrapulmonary organs. In vitro study suggested that nano-ceria would agglomerate and form sediments in the bronchoalveolar aqueous surrounding while binding to protein would be conducive to the redispersion of nano-ceria. The decrease in the size of agglomerates might enhance the penetration of nano-ceria into the systemic circulation. Our findings suggested that the effect of nanomaterial exposure, even at low concentration, should be assessed because of the potential lung and systemic cumulative toxicity of the nanomaterials.

  13. Three-dimensional core–shell ferromagnetic nanowires grown by focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Pablo-Navarro, Javier; Magén, César; María de Teresa, José

    2016-07-01

    Functional nanostructured materials often rely on the combination of more than one material to confer the desired functionality or an enhanced performance of the device. Here we report the procedure to create nanoscale heterostructured materials in the form of core–shell nanowires by focused electron beam induced deposition (FEBID) technologies. In our case, three-dimensional (3D) nanowires (<100 nm in diameter) with metallic ferromagnetic cores of Co- and Fe-FEBID have been grown and coated with a protective Pt-FEBID shell (ranging 10–20 nm in thickness) aimed to minimize the degradation of magnetic properties caused by the surface oxidation of the core to a non-ferromagnetic material. The structure, chemistry and magnetism of nanowire cores of Co and Fe have been characterized in Pt-coated and uncoated nanostructures to demonstrate that the morphology of the shell is conserved during Pt coating, the surface oxidation is suppressed or confined to the Pt layer, and the average magnetization of the core is strengthened up to 30%. The proposed approach paves the way to the fabrication of 3D FEBID nanostructures based on the smart alternate deposition of two or more materials combining different physical properties or added functionalities.

  14. Simulation-Guided 3D Nanomanufacturing via Focused Electron Beam Induced Deposition

    DOE PAGESBeta

    Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B.; Stanford, Michael G.; Plank, Harald; Rack, Philip D.

    2016-06-10

    Focused electron beam induced deposition (FEBID) is one of the few techniques that enables direct-write synthesis of free-standing 3D nanostructures. While the fabrication of simple architectures such as vertical or curving nanowires has been achieved by simple trial and error, processing complex 3D structures is not tractable with this approach. This is due, inpart, to the dynamic interplay between electron–solid interactions and the transient spatial distribution of absorbed precursor molecules on the solid surface. Here, we demonstrate the ability to controllably deposit 3D lattice structures at the micro/nanoscale, which have received recent interest owing to superior mechanical and optical properties.more » Moreover, a hybrid Monte Carlo–continuum simulation is briefly overviewed, and subsequently FEBID experiments and simulations are directly compared. Finally, a 3D computer-aided design (CAD) program is introduced, which generates the beam parameters necessary for FEBID by both simulation and experiment. In using this approach, we demonstrate the fabrication of various 3D lattice structures using Pt-, Au-, and W-based precursors.« less

  15. Chemical tuning of PtC nanostructures fabricated via focused electron beam induced deposition.

    PubMed

    Plank, Harald; Haber, Thomas; Gspan, Christian; Kothleitner, Gerald; Hofer, Ferdinand

    2013-05-01

    The fundamental dependence between process parameters during focused electron beam induced deposition and the chemistry of functional PtC nanostructures have been studied via a multi-technique approach using SEM, (S)TEM, EELS, AFM, and EFM. The study reveals that the highest Pt contents can only be achieved by an ideal balance between potentially dissociating electrons and available precursor molecules on the surface. For precursor regimes apart from this situation, an unwanted increase of carbon is observed which originates from completely different mechanisms: (1) an excess of electrons leads to polymerization of precursor fragments whereas (2) a lack of electrons leads to incompletely dissociated precursor molecules incorporated into the nanostructures. While the former represents an unwanted class of carbon, the latter condition maximizes the volume growth rates and allows for post-growth curing strategies which can strongly increase the functionality. Furthermore, the study gives an explanation of why growing deposits can dynamically change their chemistry and provides a straightforward guide towards more controlled fabrication conditions.

  16. Fabrication of high-aspect-ratio carbon nanocone probes by electron beam induced deposition patterning

    NASA Astrophysics Data System (ADS)

    Chen, I.-Chen; Chen, Li-Han; Orme, Christine; Quist, Arjan; Lal, Ratnesh; Jin, Sungho

    2006-09-01

    A high-aspect-ratio cone-shaped carbon nanotube (CNT), which we refer to as a carbon nanocone (CNC), was fabricated for scanning probe microscopy (SPM) by a novel and reliable patterning technique and dc plasma chemical vapour deposition. Carbon dots from electron beam induced deposition (EBID) were utilized as convenient chemical-etch masks to create catalyst patterns for the growth of a single CNC probe on a tipless cantilever and an array of CNC probes on a silicon substrate. This resist-free EBID process is an efficient way of preparing a patterned catalyst and resultant nanoprobe on the specific edge location of the cantilever. The CNC probe produces high-resolution images of specimens in air as well as in liquid. No degradation in imaging performance was observed after a period of continuous scanning. The CNC bed-of-nails array imaged in contact mode by a commercial Si3N4 probe demonstrates the mechanical toughness/sturdiness of the CNC tip. This also indicates the possibility of using the CNC bed-of-nails as a convenient means for the characterization of SPM tips.

  17. Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100).

    PubMed

    Schirmer, M; Walz, M-M; Vollnhals, F; Lukasczyk, T; Sandmann, A; Chen, C; Steinrück, H-P; Marbach, H

    2011-02-25

    We have investigated the lithographic generation of TiO(x) nanostructures on Si(100) via electron-beam-induced deposition (EBID) of titanium tetraisopropoxide (TTIP) in ultra-high vacuum (UHV) by scanning electron microscopy (SEM) and local Auger electron spectroscopy (AES). In addition, the fabricated nanostructures were also characterized ex situ via atomic force microscopy (AFM) under ambient conditions. In EBID, a highly focused electron beam is used to locally decompose precursor molecules and thereby to generate a deposit. A drawback of this nanofabrication technique is the unintended deposition of material in the vicinity of the impact position of the primary electron beam due to so-called proximity effects. Herein, we present a post-treatment procedure to deplete the unintended deposits by moderate sputtering after the deposition process. Moreover, we were able to observe the formation of pure titanium oxide nanocrystals (<100 nm) in situ upon heating the sample in a well-defined oxygen atmosphere. While the nanocrystal growth for the as-deposited structures also occurs in the surroundings of the irradiated area due to proximity effects, it is limited to the pre-defined regions, if the sample was sputtered before heating the sample under oxygen atmosphere. The described two-step post-treatment procedure after EBID presents a new pathway for the fabrication of clean localized nanostructures. PMID:21242619

  18. Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100)

    NASA Astrophysics Data System (ADS)

    Schirmer, M.; Walz, M.-M.; Vollnhals, F.; Lukasczyk, T.; Sandmann, A.; Chen, C.; Steinrück, H.-P.; Marbach, H.

    2011-02-01

    We have investigated the lithographic generation of TiOx nanostructures on Si(100) via electron-beam-induced deposition (EBID) of titanium tetraisopropoxide (TTIP) in ultra-high vacuum (UHV) by scanning electron microscopy (SEM) and local Auger electron spectroscopy (AES). In addition, the fabricated nanostructures were also characterized ex situ via atomic force microscopy (AFM) under ambient conditions. In EBID, a highly focused electron beam is used to locally decompose precursor molecules and thereby to generate a deposit. A drawback of this nanofabrication technique is the unintended deposition of material in the vicinity of the impact position of the primary electron beam due to so-called proximity effects. Herein, we present a post-treatment procedure to deplete the unintended deposits by moderate sputtering after the deposition process. Moreover, we were able to observe the formation of pure titanium oxide nanocrystals (<100 nm) in situ upon heating the sample in a well-defined oxygen atmosphere. While the nanocrystal growth for the as-deposited structures also occurs in the surroundings of the irradiated area due to proximity effects, it is limited to the pre-defined regions, if the sample was sputtered before heating the sample under oxygen atmosphere. The described two-step post-treatment procedure after EBID presents a new pathway for the fabrication of clean localized nanostructures.

  19. High-purity 3D nano-objects grown by focused-electron-beam induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M.; Koopmans, Bert

    2016-09-01

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ∼50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core–shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices.

  20. High-purity 3D nano-objects grown by focused-electron-beam induced deposition

    NASA Astrophysics Data System (ADS)

    Córdoba, Rosa; Sharma, Nidhi; Kölling, Sebastian; Koenraad, Paul M.; Koopmans, Bert

    2016-09-01

    To increase the efficiency of current electronics, a specific challenge for the next generation of memory, sensing and logic devices is to find suitable strategies to move from two- to three-dimensional (3D) architectures. However, the creation of real 3D nano-objects is not trivial. Emerging non-conventional nanofabrication tools are required for this purpose. One attractive method is focused-electron-beam induced deposition (FEBID), a direct-write process of 3D nano-objects. Here, we grow 3D iron and cobalt nanopillars by FEBID using diiron nonacarbonyl Fe2(CO)9, and dicobalt octacarbonyl Co2(CO)8, respectively, as starting materials. In addition, we systematically study the composition of these nanopillars at the sub-nanometer scale by atom probe tomography, explicitly mapping the homogeneity of the radial and longitudinal composition distributions. We show a way of fabricating high-purity 3D vertical nanostructures of ˜50 nm in diameter and a few micrometers in length. Our results suggest that the purity of such 3D nanoelements (above 90 at% Fe and above 95 at% Co) is directly linked to their growth regime, in which the selected deposition conditions are crucial for the final quality of the nanostructure. Moreover, we demonstrate that FEBID and the proposed characterization technique not only allow for growth and chemical analysis of single-element structures, but also offers a new way to directly study 3D core-shell architectures. This straightforward concept could establish a promising route to the design of 3D elements for future nano-electronic devices.

  1. Fabrication of electron beam deposited tip for atomic-scale atomic force microscopy in liquid.

    PubMed

    Miyazawa, K; Izumi, H; Watanabe-Nakayama, T; Asakawa, H; Fukuma, T

    2015-03-13

    Recently, possibilities of improving operation speed and force sensitivity in atomic-scale atomic force microscopy (AFM) in liquid using a small cantilever with an electron beam deposited (EBD) tip have been intensively explored. However, the structure and properties of an EBD tip suitable for such an application have not been well-understood and hence its fabrication process has not been established. In this study, we perform atomic-scale AFM measurements with a small cantilever and clarify two major problems: contaminations from a cantilever and tip surface, and insufficient mechanical strength of an EBD tip having a high aspect ratio. To solve these problems, here we propose a fabrication process of an EBD tip, where we attach a 2 μm silica bead at the cantilever end and fabricate a 500-700 nm EBD tip on the bead. The bead height ensures sufficient cantilever-sample distance and enables to suppress long-range interaction between them even with a short EBD tip having high mechanical strength. After the tip fabrication, we coat the whole cantilever and tip surface with Si (30 nm) to prevent the generation of contamination. We perform atomic-scale AFM imaging and hydration force measurements at a mica-water interface using the fabricated tip and demonstrate its applicability to such an atomic-scale application. With a repeated use of the proposed process, we can reuse a small cantilever for atomic-scale measurements for several times. Therefore, the proposed method solves the two major problems and enables the practical use of a small cantilever in atomic-scale studies on various solid-liquid interfacial phenomena.

  2. Chemical composition, morphology and optical properties of zinc sulfide coatings deposited by low-energy electron beam evaporation

    NASA Astrophysics Data System (ADS)

    Ragachev, A. V.; Yarmolenko, M. A.; Rogachev, A. A.; Gorbachev, D. L.; Zhou, Bing

    2014-06-01

    The research determines the features of formation, morphology, chemical composition and optical properties of the coatings deposited by the method, proposed for the first time, of the exposure of mechanical mixture of zinc and sulfur powders to low-energy electron beam evaporation. The findings show that the deposited coatings are characterized by high chemical and structural homogeneity in thickness. The study considers the influence of substrate temperature and thickness of the deposited layer on the morphology and the width of the formed ZnS thin layers band gap. Also was shown the possibility to form ZnS coatings with this method using the mixture of zinc and copper sulfide powders.

  3. Towards a single step process to create high purity gold structures by electron beam induced deposition at room temperature.

    PubMed

    Mansilla, C; Mehendale, S; Mulders, J J L; Trompenaars, P H F

    2016-10-14

    Highly pure metallic structures can be deposited by electron beam induced deposition and they have many important applications in different fields. The organo-metallic precursor is decomposed and deposited under the electron beam, and typically it is purified with post-irradiation in presence of O2. However, this approach limits the purification to the surface of the deposit. Therefore, 'in situ' purification during deposition using simultaneous flows of both O2 and precursor in parallel with two gas injector needles has been tested and verified. To simplify the practical arrangements, a special concentric nozzle has been designed allowing deposition and purification performed together in a single step. With this new device metallic structures with high purity can be obtained more easily, while there is no limit on the height of the structures within a practical time frame. In this work, we summarize the first results obtained for 'in situ' Au purification using this concentric nozzle, which is described in more detail, including flow simulations. The operational parameter space is explored in order to optimize the shape as well as the purity of the deposits, which are evaluated through scanning electron microscope and energy dispersive x-ray spectroscopy measurements, respectively. The observed variations are interpreted in relation to other variables, such as the deposition yield. The resistivity of purified lines is also measured, and the influence of additional post treatments as a last purification step is studied. PMID:27587078

  4. Towards a single step process to create high purity gold structures by electron beam induced deposition at room temperature

    NASA Astrophysics Data System (ADS)

    Mansilla, C.; Mehendale, S.; Mulders, J. J. L.; Trompenaars, P. H. F.

    2016-10-01

    Highly pure metallic structures can be deposited by electron beam induced deposition and they have many important applications in different fields. The organo-metallic precursor is decomposed and deposited under the electron beam, and typically it is purified with post-irradiation in presence of O2. However, this approach limits the purification to the surface of the deposit. Therefore, ‘in situ’ purification during deposition using simultaneous flows of both O2 and precursor in parallel with two gas injector needles has been tested and verified. To simplify the practical arrangements, a special concentric nozzle has been designed allowing deposition and purification performed together in a single step. With this new device metallic structures with high purity can be obtained more easily, while there is no limit on the height of the structures within a practical time frame. In this work, we summarize the first results obtained for ‘in situ’ Au purification using this concentric nozzle, which is described in more detail, including flow simulations. The operational parameter space is explored in order to optimize the shape as well as the purity of the deposits, which are evaluated through scanning electron microscope and energy dispersive x-ray spectroscopy measurements, respectively. The observed variations are interpreted in relation to other variables, such as the deposition yield. The resistivity of purified lines is also measured, and the influence of additional post treatments as a last purification step is studied.

  5. Towards a single step process to create high purity gold structures by electron beam induced deposition at room temperature.

    PubMed

    Mansilla, C; Mehendale, S; Mulders, J J L; Trompenaars, P H F

    2016-10-14

    Highly pure metallic structures can be deposited by electron beam induced deposition and they have many important applications in different fields. The organo-metallic precursor is decomposed and deposited under the electron beam, and typically it is purified with post-irradiation in presence of O2. However, this approach limits the purification to the surface of the deposit. Therefore, 'in situ' purification during deposition using simultaneous flows of both O2 and precursor in parallel with two gas injector needles has been tested and verified. To simplify the practical arrangements, a special concentric nozzle has been designed allowing deposition and purification performed together in a single step. With this new device metallic structures with high purity can be obtained more easily, while there is no limit on the height of the structures within a practical time frame. In this work, we summarize the first results obtained for 'in situ' Au purification using this concentric nozzle, which is described in more detail, including flow simulations. The operational parameter space is explored in order to optimize the shape as well as the purity of the deposits, which are evaluated through scanning electron microscope and energy dispersive x-ray spectroscopy measurements, respectively. The observed variations are interpreted in relation to other variables, such as the deposition yield. The resistivity of purified lines is also measured, and the influence of additional post treatments as a last purification step is studied.

  6. Effects of oxygen on electron beam induced deposition of SiO{sub 2} using physisorbed and chemisorbed tetraethoxysilane

    SciTech Connect

    Bishop, James; Toth, Milos; Phillips, Matthew; Lobo, Charlene

    2012-11-19

    Electron beam induced deposition (EBID) is limited by low throughput and purity of as-grown material. Co-injection of O{sub 2} with the growth precursor is known to increase both the purity and deposition rate of materials such as SiO{sub 2} at room temperature. Here, we show that O{sub 2} inhibits rather than enhances EBID from tetraethoxysilane (TEOS) precursor at elevated temperatures. This behavior is attributed to surface site competition between chemisorbates at elevated temperature, and TEOS decomposition by atomic oxygen produced through electron dissociation of physisorbed O{sub 2} at room temperature.

  7. TEM sample preparation using a new nanofabrication technique combining electron-beam-induced deposition and low-energy ion milling.

    PubMed

    Mitsuishi, Kazutaka; Shimojo, Masayuki; Tanaka, Miyoko; Takeguchi, Masaki; Song, Minghui; Furuya, Kazuo

    2006-12-01

    A new TEM sample preparation technique using electron-beam-induced deposition combined with low-energy ion milling was used to fabricate for two different shapes of sample, conical and plate. High-quality HREM images can be obtained from samples prepared by this technique. A desired sample position can be obtained with high accuracy, and the total sample preparation time can be much less than conventional techniques. Because the gas deposition system used can easily be integrated in a conventional SEM, the method can be performed in any laboratory equipped with a SEM and an ion milling machine.

  8. A nanoscale three-dimensional Monte Carlo simulation of electron-beam-induced deposition with gas dynamics.

    PubMed

    Smith, D A; Fowlkes, J D; Rack, P D

    2007-07-01

    A computer simulation was developed to simulate electron-beam-induced deposition (EBID). Simulated growth produced high-aspect-ratio, nanoscale pillar structures by simulating a stationary Gaussian electron beam. The simulator stores in memory the spatial and temporal coordinates of deposited atoms in addition to the type of electron, either primary (PE), back-scattered (BSE), or secondary (SE), that induced its deposition. The results provided in this paper apply to tungsten pillar growth by EBID on a tungsten substrate from WF(6) precursor, although the simulation may be applied to any substrate-precursor set. The details of the simulation are described including the Monte Carlo electron-solid interaction simulation used to generate scattered electron trajectories and SE generation, the probability of molecular dissociation of the precursor gas when an electron traverses the surface, and the gas dynamics which control the surface coverage of the WF(6) precursor on the substrate and pillar surface. In this paper, three specific studies are compared: the effects of beam energy, mass transport versus reaction-rate-limited growth, and the effects of surface diffusion on the EBID process.

  9. Method of fabricating conducting oxide-silicon solar cells utilizing electron beam sublimation and deposition of the oxide

    DOEpatents

    Feng, Tom; Ghosh, Amal K.

    1979-01-01

    In preparing tin oxide and indium tin oxide-silicon heterojunction solar cells by electron beam sublimation of the oxide and subsequent deposition thereof on the silicon, the engineering efficiency of the resultant cell is enhanced by depositing the oxide at a predetermined favorable angle of incidence. Typically the angle of incidence is between 40.degree. and 70.degree. and preferably between 55.degree. and 65.degree. when the oxide is tin oxide and between 40.degree. and 70.degree. when the oxide deposited is indium tin oxide. gi The Government of the United States of America has rights in this invention pursuant to Department of Energy Contract No. EY-76-C-03-1283.

  10. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors.

    PubMed

    Thorman, Rachel M; Kumar T P, Ragesh; Fairbrother, D Howard; Ingólfsson, Oddur

    2015-01-01

    Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different

  11. The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

    PubMed Central

    Thorman, Rachel M; Kumar T. P., Ragesh; Fairbrother, D Howard

    2015-01-01

    Summary Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition outside the area of the primary electron beam and in metal purity due to incomplete precursor decomposition. Both limitations are likely in part caused by reactions of precursor molecules with low-energy (<100 eV) secondary electrons generated by interactions of the primary beam with the substrate. These low-energy electrons are abundant both inside and outside the area of the primary electron beam and are associated with reactions causing incomplete ligand dissociation from FEBID precursors. As it is not possible to directly study the effects of secondary electrons in situ in FEBID, other means must be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface studies on adsorbed precursor molecules can provide information on surface speciation and identify species desorbing from a substrate during electron irradiation under conditions more representative of FEBID. Comparing gas phase and surface science studies allows for insight into the primary deposition mechanisms for individual precursors; ideally, this information can be used to design future FEBID precursors and optimize deposition conditions. In this review, we give a summary of different low-energy electron-induced fragmentation processes that can be initiated by the secondary electrons generated in FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the

  12. In situ mass measurement of electron-beam-induced nanometer-sized W-related deposits using a carbon nanotube cantilever

    SciTech Connect

    Sawaya, Shintaro; Akita, Seiji; Nakayama, Yoshikazu

    2006-11-06

    Using a carbon nanotube oscillator, the authors performed in situ measurements of densities of electron-beam-induced tungsten compounds with size of less than 100 nm. Total mass of the deposit was proportional to the deposition time. A higher deposition rate was obtained at lower electron-beam acceleration voltage. Density of the deposit decreased from 2.7 to 1.4 g/cm{sup 3} with increasing acceleration voltage from 5 to 15 kV. These results indicate that the increased density with low-acceleration voltage produces effective decomposition of W(CO){sub 6}.

  13. Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

    NASA Astrophysics Data System (ADS)

    Comes, Ryan; Gu, Man; Khokhlov, Mikhail; Liu, Hongxue; Lu, Jiwei; Wolf, Stuart A.

    2013-01-01

    Complex oxide epitaxial film growth is a rich and exciting field, owing to the wide variety of physical properties present in oxides. These properties include ferroelectricity, ferromagnetism, spin-polarization, and a variety of other correlated phenomena. Traditionally, high quality epitaxial oxide films have been grown via oxide molecular beam epitaxy or pulsed laser deposition. Here, we present the growth of high quality epitaxial films using an alternative approach, the pulsed electron-beam deposition technique. We demonstrate all three epitaxial growth modes in different oxide systems: Frank-van der Merwe (layer-by-layer); Stranski-Krastanov (layer-then-island); and Volmer-Weber (island). Analysis of film quality and morphology is presented and techniques to optimize the morphology of films are discussed.

  14. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction

    DOE PAGESBeta

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Roberts, Nicholas A.; Plank, Harald; Rack, Philip D.

    2014-11-05

    Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributedmore » to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.« less

  15. Purification of Nanoscale Electron-Beam-Induced Platinum Deposits via a Pulsed Laser-Induced Oxidation Reaction

    SciTech Connect

    Stanford, Michael G.; Lewis, Brett B.; Noh, Joo Hyon; Fowlkes, Jason Davidson; Roberts, Nicholas A.; Plank, Harald; Rack, Philip D.

    2014-11-05

    Platinum–carbon deposits made via electron-beam-induced deposition were purified in this study via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ~485 K, and the purification rate is a function of the PtC5 thickness (80–360 nm) and laser pulse width (1–100 μs) in the ranges studied. The thickness dependence is attributed to the ~235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Finally, remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.

  16. Reversible wettability of electron-beam deposited indium-tin-oxide driven by ns-UV irradiation

    SciTech Connect

    Persano, Luana; Del Carro, Pompilio; Pisignano, Dario

    2012-04-09

    Indium tin oxide (ITO) is one of the most widely used semiconductor oxides in the field of organic optoelectronics, especially for the realization of anode contacts. Here the authors report on the control of the wettability properties of ITO films deposited by reactive electron beam deposition and irradiated by means of nanosecond-pulsed UV irradiation. The enhancement of the surface water wettability, with a reduction of the water contact angle larger than 50 deg., is achieved by few tens of seconds of irradiation. The analyzed photo-induced wettability change is fully reversible in agreement with a surface-defect model, and it can be exploited to realize optically transparent, conductive surfaces with controllable wetting properties for sensors and microfluidic circuits.

  17. On the magnetic properties of iron nanostructures fabricated via focused electron beam induced deposition and autocatalytic growth processes.

    PubMed

    Tu, F; Drost, M; Vollnhals, F; Späth, A; Carrasco, E; Fink, R H; Marbach, H

    2016-09-01

    We employ Electron beam induced deposition (EBID) in combination with autocatalytic growth (AG) processes to fabricate magnetic nanostructures with controllable shapes and thicknesses. Following this route, different Fe deposits were prepared on silicon nitride membranes under ultra-high vacuum conditions and studied by scanning electron microscopy (SEM) and scanning transmission x-ray microspectroscopy (STXM). The originally deposited Fe nanostructures are composed of pure iron, especially when fabricated via autocatalytic growth processes. Quantitative near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was employed to derive information on the thickness dependent composition. X-ray magnetic circular dichroism (XMCD) in STXM was used to derive the magnetic properties of the EBID prepared structures. STXM and XMCD analysis evinces the existence of a thin iron oxide layer at the deposit-vacuum interface, which is formed during exposure to ambient conditions. We were able to extract magnetic hysteresis loops for individual deposits from XMCD micrographs with varying external magnetic field. Within the investigated thickness range (2-16 nm), the magnetic coercivity, as evaluated from the width of the hysteresis loops, increases with deposit thickness and reaches a maximum value of ∼160 Oe at around 10 nm. In summary, we present a viable technique to fabricate ferromagnetic nanostructures in a controllable way and gain detailed insight into their chemical and magnetic properties.

  18. On the magnetic properties of iron nanostructures fabricated via focused electron beam induced deposition and autocatalytic growth processes

    NASA Astrophysics Data System (ADS)

    Tu, F.; Drost, M.; Vollnhals, F.; Späth, A.; Carrasco, E.; Fink, R. H.; Marbach, H.

    2016-09-01

    We employ Electron beam induced deposition (EBID) in combination with autocatalytic growth (AG) processes to fabricate magnetic nanostructures with controllable shapes and thicknesses. Following this route, different Fe deposits were prepared on silicon nitride membranes under ultra-high vacuum conditions and studied by scanning electron microscopy (SEM) and scanning transmission x-ray microspectroscopy (STXM). The originally deposited Fe nanostructures are composed of pure iron, especially when fabricated via autocatalytic growth processes. Quantitative near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was employed to derive information on the thickness dependent composition. X-ray magnetic circular dichroism (XMCD) in STXM was used to derive the magnetic properties of the EBID prepared structures. STXM and XMCD analysis evinces the existence of a thin iron oxide layer at the deposit-vacuum interface, which is formed during exposure to ambient conditions. We were able to extract magnetic hysteresis loops for individual deposits from XMCD micrographs with varying external magnetic field. Within the investigated thickness range (2-16 nm), the magnetic coercivity, as evaluated from the width of the hysteresis loops, increases with deposit thickness and reaches a maximum value of ˜160 Oe at around 10 nm. In summary, we present a viable technique to fabricate ferromagnetic nanostructures in a controllable way and gain detailed insight into their chemical and magnetic properties.

  19. Electron beam-physical vapor deposition of SiC/SiO 2 high emissivity thin film

    NASA Astrophysics Data System (ADS)

    Yi, Jian; He, XiaoDong; Sun, Yue; Li, Yao

    2007-02-01

    When heated by high-energy electron beam (EB), SiC can decompose into C and Si vapor. Subsequently, Si vapor reacts with metal oxide thin film on substrate surface and formats dense SiO 2 thin film at high substrate temperature. By means of the two reactions, SiC/SiO 2 composite thin film was prepared on the pre-oxidized 316 stainless steel (SS) substrate by electron beam-physical vapor deposition (EB-PVD) only using β-SiC target at 1000 °C. The thin film was examined by energy dispersive spectroscopy (EDS), grazing incidence X-ray asymmetry diffraction (GIAXD), scanning electron microscopy (SEM), atomic force microscopy (AFM), backscattered electron image (BSE), electron probe microanalysis (EPMA), X-ray photoelectron spectroscopy (XPS) and Fourier transformed infra-red (FT-IR) spectroscopy. The analysis results show that the thin film is mainly composed of imperfect nano-crystalline phases of 3C-SiC and SiO 2, especially, SiO 2 phase is nearly amorphous. Moreover, the smooth and dense thin film surface consists of nano-sized particles, and the interface between SiC/SiO 2 composite thin film and SS substrate is perfect. At last, the emissivity of SS substrate is improved by the SiC/SiO 2 composite thin film.

  20. Dynamic modulation of electronic properties of graphene by localized carbon doping using focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Kim, S.; Russell, M.; Henry, M.; Kim, S. S.; Naik, R. R.; Voevodin, A. A.; Jang, S. S.; Tsukruk, V. V.; Fedorov, A. G.

    2015-09-01

    We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated from a low dose of high energy (25 keV) electron beam (1 × 1018 e- per cm2). Detailed AFM imaging provides direct evidence of the new mechanism responsible for dynamic evolution of the locally varying graphene doping. The FEBID carbon atoms, which are physisorbed and weakly bound to graphene, diffuse towards the middle of graphene conduction channel due to their surface chemical potential gradient, resulting in negative shift of Dirac voltage. Increasing a primary electron dose to 1 × 1019 e- per cm2 results in a significant increase of carbon deposition, such that it covers the entire graphene conduction channel at high surface density, leading to n-doping of graphene channel. Collectively, these findings establish a unique capability of FEBID technique to dynamically modulate the doping state of graphene, thus enabling a new route to resist-free, ``direct-write'' functional patterning of graphene-based electronic devices with potential for on-demand re-configurability.We report on the first demonstration of controllable carbon doping of graphene to engineer local electronic properties of a graphene conduction channel using focused electron beam induced deposition (FEBID). Electrical measurements indicate that an ``n-p-n'' junction on graphene conduction channel is formed by partial carbon deposition near the source and drain metal contacts by low energy (<50 eV) secondary electrons due to inelastic collisions of long range backscattered primary electrons generated

  1. Electron Beam Lithography

    NASA Astrophysics Data System (ADS)

    Harriott, Lloyd R.

    1997-04-01

    V) electrons. The entire mask structure is essentially transparent to the electron beam and little energy is deposited there. The portions of the beam which pass through the high atomic number pattern layer are scattered through angles of a few milliradians. An aperture in the back focal plane of the electron projection imaging lenses stops the scattered electrons and produces a high contrast image at the plane of the semiconductor wafer. Such echniques may lead to a prominent role for electrons in main-stream patterning for semiconductor fabrication. One hundred years after their discovery, electron beams are just on the threshold of a very promising future.

  2. On the magnetic properties of iron nanostructures fabricated via focused electron beam induced deposition and autocatalytic growth processes

    NASA Astrophysics Data System (ADS)

    Tu, F.; Drost, M.; Vollnhals, F.; Späth, A.; Carrasco, E.; Fink, R. H.; Marbach, H.

    2016-09-01

    We employ Electron beam induced deposition (EBID) in combination with autocatalytic growth (AG) processes to fabricate magnetic nanostructures with controllable shapes and thicknesses. Following this route, different Fe deposits were prepared on silicon nitride membranes under ultra-high vacuum conditions and studied by scanning electron microscopy (SEM) and scanning transmission x-ray microspectroscopy (STXM). The originally deposited Fe nanostructures are composed of pure iron, especially when fabricated via autocatalytic growth processes. Quantitative near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was employed to derive information on the thickness dependent composition. X-ray magnetic circular dichroism (XMCD) in STXM was used to derive the magnetic properties of the EBID prepared structures. STXM and XMCD analysis evinces the existence of a thin iron oxide layer at the deposit–vacuum interface, which is formed during exposure to ambient conditions. We were able to extract magnetic hysteresis loops for individual deposits from XMCD micrographs with varying external magnetic field. Within the investigated thickness range (2–16 nm), the magnetic coercivity, as evaluated from the width of the hysteresis loops, increases with deposit thickness and reaches a maximum value of ∼160 Oe at around 10 nm. In summary, we present a viable technique to fabricate ferromagnetic nanostructures in a controllable way and gain detailed insight into their chemical and magnetic properties.

  3. Fabrication and electrical transport properties of binary Co-Si nanostructures prepared by focused electron beam-induced deposition

    SciTech Connect

    Porrati, F.; Huth, M.; Kaempken, B.; Terfort, A.

    2013-02-07

    CoSi-C binary alloys have been fabricated by focused electron beam-induced deposition by the simultaneous use of dicobaltoctacarbonyl, Co{sub 2}(CO){sub 8}, and neopentasilane, Si{sub 5}H{sub 12}, as precursor gases. By varying the relative flux of the precursors, alloys with variable chemical composition are obtained, as shown by energy dispersive x-ray analysis. Room temperature electrical resistivity measurements strongly indicate the formation of cobalt silicide and cobalt disilicide nanoclusters embedded in a carbonaceous matrix. Temperature-dependent electrical conductivity measurements show that the transport properties are governed by electron tunneling between neighboring CoSi or CoSi{sub 2} nanoclusters. In particular, by varying the metal content of the alloy, the electrical conductivity can be finely tuned from the insulating regime into the quasi-metallic tunneling coupling regime.

  4. Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

    SciTech Connect

    Gallais, Laurent; Capoulade, Jeremie; Natoli, Jean-Yves; Commandre, Mireille; Cathelinaud, Michel; Koc, Cian; Lequime, Michel

    2008-05-01

    A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO2 starting material), reactive low voltage ion plating, and dual ion beam sputtering.The laser damage thresholds of these coatings are determined at 1064 and 355 nm using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy.

  5. Electron Beams for Fast Ignition

    NASA Astrophysics Data System (ADS)

    Fonseca, R. A.; Davies, J. R.; Silva, L. O.

    2004-11-01

    In the fast ignitor scenario an intense relativistic electron beam is used to deposit energy inside the fuel target and trigger the thermonuclear reaction. This electron beam is produced on the outer plasma layer of the target by the interaction of an ultra-intense laser. The energy transfer from the laser to the electron beam, and the stability of the propagation of the electron beam are crucial for a successful fast ignitor scheme. We have used three-dimensional particle-in-cell simulations using the OSIRIS.framework [1] to explore the self-consistent generation of high current electron beams by ultra intense lasers. Novel laser pulse configurations are explored in order to generate electron beams transporting more energy, and capable of avoiding the deleterious effects of collisionless instabilities in the plasma corona. [1] R. A. Fonseca et al., LNCS 2331, 342-351, (Springer, Heidelberg, 2002);

  6. Optical properties of nanocrystalline Y2O3 thin films grown on quartz substrates by electron beam deposition

    NASA Astrophysics Data System (ADS)

    Wiktorczyk, Tadeusz; Biegański, Piotr; Serafińczuk, Jarosław

    2016-09-01

    Yttrium oxide thin films of a thickness 221-341 nm were formed onto quartz substrates by reactive physical vapor deposition in an oxygen atmosphere. An electron beam gun was applied as a deposition source. The effect of substrate temperature during film deposition (in the range of 323-673 K) on film structure, surface morphology and optical properties was investigated. The surface morphology studies (with atomic force microscopy and diffuse spectra reflectivity) show that the film surface was relatively smooth with RMS surface roughness in the range of 1.7-3.8 nm. XRD analysis has revealed that all diffraction lines belong to a cubic Y2O3 structure. The films consisted of small nanocrystals. Their average grain size increases from 1.6 nm to 22 nm, with substrate temperature rising from 323 K to 673 K. Optical examinations of transmittance and reflectance were performed in the spectral range of 0.2-2.5 μm. Optical constants and their dispersion curves were determined. Values of the refractive index of the films were in the range of n = 1.79-1.90 (at 0.55 μm) for substrate temperature during film deposition of 323-673 K. The changes in the refractive index upon substrate temperature correspond very well with the increase in the nanocrystals grain diameter and with film porosity.

  7. Properties of optical thin films and coatings prepared by reactive electron-beam deposition with and without ion bombardments

    NASA Astrophysics Data System (ADS)

    Tsai, Rung Y.; Shiau, Sen C.; Lee, Chii H.; Ho, Fang C.; Hua, Mu-Yi

    1997-12-01

    The structural, microstructural, optical, and mechanical properties of MgF2, SiO2, and TiO2 films prepared by reactive electron-beam deposition (EBD) and reactive ion- assisted deposition (IAD) were systematically investigated using an x-ray diffractometer (XRD), a transmission electron microscope, a spectrophotometer, and a microhardness tester, respectively. A mixture gas of pure argon and pure oxygen was used as the reactant. The mean ion energy was about 90 eV for the IAD process. Results show that the preferred orientation, refractive index, and hardness of the films were strongly influenced by ion bombardments, although the variations of the phases and grain sizes were insignificant. With the fixed x- ray incident angle of 2 deg, the measured preferred orientation of polycrystalline MgF2 films deposited on unheated glass substrate by IAD was [110], which was consistent with the powder XRD pattern of MgF2, whereas that of the film deposited by EBD at a substrate temperature of 280 degrees Celsius was [111]. The refractive index and hardness of the films deposited by IAD were always higher than those of the respective films deposited by EBD at a substrate temperature of 280 degrees Celsius, which were due to the higher packing density caused by energetic ion bombardments. A 24-layer near-IR cutoff filter of alternating SiO2 and TiO2 layers prepared by IAD was more efficient on near-IR isolation and more thermally stable than that prepared by EBD. The optical thickness variation for the filter prepared by IAD over a substrate holder radius of 30 cm was less than 1%.

  8. Pulsed electron beam deposition of highly oriented thin films of polytetrafluoroethylene

    NASA Astrophysics Data System (ADS)

    Chandra, Vimlesh; Manoharan, Solomon S.

    2008-04-01

    Thin films of polytetrafluoroethylene (PTFE) were deposited by pulsed electron deposition (PED) technique. The transmission electron microscopy (TEM) image of the RT fabricated (20 Å thick) film on carbon coated copper grid shows crystalline nature. Infrared spectra show one to one correspondence between PED ablated film and the PTFE bulk target. The asymmetrical and symmetrical -CF 2- stretching modes were observed at 1220 and 1156 cm -1, respectively. The -CF 2- wagging and bending modes occur at 644 and 512 cm -1, respectively. X-ray diffraction patterns of the film deposited at room temperature (RT) show oriented film along (1 0 0) plane of hexagonal structure and the crystalline nature is retained up to 300 °C on vacuum annealing. The room temperature fabricated film shows smooth and pin hole free surface whereas post-annealing brings discontinuity, roughness and pin holes.

  9. Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask

    NASA Astrophysics Data System (ADS)

    Hashiba, Hideomi; Miyazaki, Yuta; Matsushita, Sachiko

    2013-09-01

    Titanium dioxide (TiO2) has been draw attention for wide range of applications from photonic crystals for visible light range by its catalytic characteristics to tera-hertz range by its high refractive index. We present an experimental study of fabrication of fine structures of TiO2 with a ZEP electron beam resist mask followed by Ti sputter deposition techniques. A TiO2 thin layer of 150 nm thick was grown on an FTO glass substrate with a fine patterned ZEP resist mask by a conventional RF magnetron sputter method with Ti target. The deposition was carried out with argon-oxygen gases at a pressure of 5.0 x 10 -1 Pa in a chamber. During the deposition, ratio of Ar-O2 gas was kept to the ratio of 2:1 and the deposition ratio was around 0.5 Å/s to ensure enough oxygen to form TiO2 and low temperature to avoid deformation of fine pattern of the ZPU resist mask. Deposited TiO2 layers are white-transparent, amorphous, and those roughnesses are around 7 nm. Fabricated TiO2 PCs have wider TiO2 slabs of 112 nm width leaving periodic 410 x 410 nm2 air gaps. We also studied transformation of TiO2 layers and TiO2 fine structures by baking at 500 °C. XRD measurement for TiO2 shows that the amorphous TiO2 transforms to rutile and anatase forms by the baking while keeping the same profile of the fine structures. Our fabrication method can be one of a promising technique to optic devices on researches and industrial area.

  10. Direct writing of CoFe alloy nanostructures by focused electron beam induced deposition from a heteronuclear precursor

    NASA Astrophysics Data System (ADS)

    Porrati, F.; Pohlit, M.; Müller, J.; Barth, S.; Biegger, F.; Gspan, C.; Plank, H.; Huth, M.

    2015-11-01

    Recently, focused electron beam-induced deposition has been employed to prepare functional magnetic nanostructures with potential in nanomagnetic logic and sensing applications by using homonuclear precursor gases like Fe(CO)5 or Co2(CO)8. Here we show that an extension towards the fabrication of bi-metallic compounds is possible by using a single-source heteronuclear precursor gas. We have grown CoFe alloy magnetic nanostructures from the HFeCo3(CO)12 metal carbonyl precursor. The compositional analysis indicates that the samples contain about 80 at% of metal and 10 at% of carbon and oxygen. Four-probe magnetotransport measurements are carried out on nanowires of various sizes down to a width of 50 nm, for which a room temperature resistivity of 43 μΩcm is found. Micro-Hall magnetometry reveals that 50 nm × 250 nm nanobars of the material are ferromagnetic up to the highest measured temperature of 250 K. Finally, the transmission electron microscopy (TEM) microstructural investigation shows that the deposits consist of a bcc Co-Fe phase mixed with a FeCo2 O4 spinel oxide phase with nanograins of about 5 nm diameter.

  11. Electron-beam-deposited thin polymer films - Electrical properties vs bombarding current.

    NASA Technical Reports Server (NTRS)

    Babcock, L. E.; Christy, R. W.

    1972-01-01

    Polymer films about 150 A thick, deposited on glass substrates by electron bombardment of tetramethyltetraphenyltrisiloxane, were studied, after being sandwiched between evaporated aluminum electrodes, the top one semitransparent. The capacitance, conductance, and photoconductance of the sandwiches were measured at room temperature as a function of the electron bombarding current which formed the polymer. The polymer thickness was obtained independently from Christy's (1960) empirical formula for the rate of formation. The obtained results indicate that, with increasing bombarding current, the polymer undergoes an increase in both crosslinking bonds and dangling bonds. Exposure to air drastically reduces the density of dangling bonds, but does not affect the crosslinking.

  12. Structural and Optical Properties of Cd 1- x Se x Thin Films Deposited by Electron Beam Evaporation Technique

    NASA Astrophysics Data System (ADS)

    Tripathi, Ravishankar Nath; Verma, Aneet Kumar; Rahul, Vishwakarma, S. R.

    2011-10-01

    Cadmium selenide (CdSe) thin films deposited by means of electron beam evaporation technique under high vacuum ˜10 -5 torr on ultrasonically cleaned glass substrate. Using stating materials of various compositions of cadmium and selenium using formula Cd 1- x Se x where x is orbitory constant having value 0.20≤ x ≤0.40 here we take less value of x for the creation of anion vacancy in thin films. In present work the structural properties have been studies using XRD technique and found that starting materials and thin films both are polycrystalline in nature having hexagonal structure. Here we study the effect of composition ratio Cd/Se in starting material and its prepared thin films on its grain size and lattice parameter. From the analysis of X-Ray diffractogram found that lattice parameter and grain size both are decreases with increasing Cd/Se ratio in thin films as well as in starting material the preferred orientation in thin films along (100) plane. The surface morphology was studied using SEM characterization and found that films are smooth and homogeneous. The films have been analysed for optical band gap and absorbed a direct band gap.

  13. Resonant light scattering from a single dielectric nano-antenna formed by electron beam-induced deposition

    PubMed Central

    Lee, Eun-Khwang; Song, Jung-Hwan; Jeong, Kwang-Yong; Kang, Ju-Hyung; Park, Hong-Gyu; Seo, Min-Kyo

    2015-01-01

    Dielectric nano-antennas are promising elements in nanophotonics due to their low material loss and strong leaky-mode optical resonances. In particular, light scattering can be easily manipulated using dielectric nano-antennas. To take full advantage of dielectric nano-antennas and explore their new optical applications, it is necessary to fabricate three-dimensional nano-structures under arbitrary conditions such as in non-planar substrates. Here, we demonstrate full-visible-range resonant light scattering from a single dielectric optical nano-rod antenna. The nano-rod antenna was formed by electron beam-induced deposition (EBID), a promising three-dimensional nanofabrication technique with a high spatial resolution. The nano-rods consist of amorphous alloys of C and O, with a width of 180 nm on average and a length of 4.5 μm. Polarization-resolved dark-field scattering measurements show that both transverse-electric and transverse-magnetic mode resonances cover the full visible range as the height of the nano-rod antenna varies from 90 to 280 nm. Numerical simulations successfully reproduce the measured scattering features and characterize the modal properties, using the critical points dispersive dielectric constant of the EBID carbonaceous material. Our deep understanding of resonant light scattering in the EBID dielectric nano-antenna will be useful for near-field measurement or for the implementation of three-dimensional nanophotonic devices. PMID:25988729

  14. Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon

    SciTech Connect

    Kamineni, Himani S.; Kamineni, Vimal K.; Moore, Richard L.; Gallis, Spyros; Diebold, Alain C.; Huang Mengbing; Kaloyeros, Alain E.

    2012-01-01

    Thermal oxidation effects on the structural, compositional, and optical properties of erbium films deposited on silicon via electron beam evaporation were analyzed by x-ray diffraction, x-ray photoelectron spectroscopy, Auger electron spectroscopy, and spectroscopic ellipsometry. A gradual rise in oxidation temperature from 700 to 900 deg. C resulted in a transition from ErO- to Er{sub 2}O{sub 3}-rich phase. Additional increase in oxidation temperature above 1000 deg. C led to the formation of erbium silicate due to further oxygen incorporation, as well as silicon out-diffusion from the substrate. A silicon oxide interfacial layer was also detected, with its thickness increasing with higher oxidation temperature. Additionally, film refractive index decreased, while its Tauc bandgap value increased from {approx}5.2 eV to {approx}6.4 eV, as the oxidation temperature was raised from 700 deg. C to above 900 deg. C. These transformations were accompanied by the appearance of an intense and broad absorption band below the optical gap. Thermal oxidation effects are discussed in the context of film structural characteristics and defect states.

  15. Resonant light scattering from a single dielectric nano-antenna formed by electron beam-induced deposition.

    PubMed

    Lee, Eun-Khwang; Song, Jung-Hwan; Jeong, Kwang-Yong; Kang, Ju-Hyung; Park, Hong-Gyu; Seo, Min-Kyo

    2015-05-19

    Dielectric nano-antennas are promising elements in nanophotonics due to their low material loss and strong leaky-mode optical resonances. In particular, light scattering can be easily manipulated using dielectric nano-antennas. To take full advantage of dielectric nano-antennas and explore their new optical applications, it is necessary to fabricate three-dimensional nano-structures under arbitrary conditions such as in non-planar substrates. Here, we demonstrate full-visible-range resonant light scattering from a single dielectric optical nano-rod antenna. The nano-rod antenna was formed by electron beam-induced deposition (EBID), a promising three-dimensional nanofabrication technique with a high spatial resolution. The nano-rods consist of amorphous alloys of C and O, with a width of 180 nm on average and a length of 4.5 μm. Polarization-resolved dark-field scattering measurements show that both transverse-electric and transverse-magnetic mode resonances cover the full visible range as the height of the nano-rod antenna varies from 90 to 280 nm. Numerical simulations successfully reproduce the measured scattering features and characterize the modal properties, using the critical points dispersive dielectric constant of the EBID carbonaceous material. Our deep understanding of resonant light scattering in the EBID dielectric nano-antenna will be useful for near-field measurement or for the implementation of three-dimensional nanophotonic devices.

  16. A study on the radiation resistance of CdWO4 thin-film scintillators deposited by using an electron-beam physical vapor deposition method

    NASA Astrophysics Data System (ADS)

    Park, Seyong; Yoon, Young Soo

    2016-09-01

    In this paper, we report the first successful fabrication of CdWO4 thin film scintillators deposited on quartz glass substrates by using an electron-beam physical vapor deposition method. The films were dense, uniform, and crack-free. CdWO4 thin-film samples of varying thicknesses were investigated by using structural and optical characterization techniques. An optimized thickness for the CdWO4 thin-film scintillators was discovered. The scintillation and the optical properties were found to depend strongly on the annealing process. The annealing process resulted in thin films with a distinct crystal structure and with improved transparency and scintillation properties. For potential applications in gamma-ray energy storage systems, photoluminescence measurements were performed using gamma rays at a dose rate of 10 kGy h-1.

  17. Fabrication of FeSi and Fe3Si compounds by electron beam induced mixing of [Fe/Si]2 and [Fe3/Si]2 multilayers grown by focused electron beam induced deposition

    NASA Astrophysics Data System (ADS)

    Porrati, F.; Sachser, R.; Gazzadi, G. C.; Frabboni, S.; Huth, M.

    2016-06-01

    Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, Fe(CO)5, and neopentasilane, Si5H12 as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way, we are able to fabricate FeSi and Fe3Si binary compounds from [Fe/Si]2 and [Fe3/Si]2 multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.

  18. Energy deposition evaluation for ultra-low energy electron beam irradiation systems using calibrated thin radiochromic film and Monte Carlo simulations.

    PubMed

    Matsui, S; Mori, Y; Nonaka, T; Hattori, T; Kasamatsu, Y; Haraguchi, D; Watanabe, Y; Uchiyama, K; Ishikawa, M

    2016-05-01

    For evaluation of on-site dosimetry and process design in industrial use of ultra-low energy electron beam (ULEB) processes, we evaluate the energy deposition using a thin radiochromic film and a Monte Carlo simulation. The response of film dosimeter was calibrated using a high energy electron beam with an acceleration voltage of 2 MV and alanine dosimeters with uncertainty of 11% at coverage factor 2. Using this response function, the results of absorbed dose measurements for ULEB were evaluated from 10 kGy to 100 kGy as a relative dose. The deviation between the responses of deposit energy on the films and Monte Carlo simulations was within 15%. As far as this limitation, relative dose estimation using thin film dosimeters with response function obtained by high energy electron irradiation and simulation results is effective for ULEB irradiation processes management. PMID:27250416

  19. Impact of deposition parameters on the performance of ceria based resistive switching memories

    NASA Astrophysics Data System (ADS)

    Zhang, Lepeng; Younis, Adnan; Chu, Dewei; Li, Sean

    2016-07-01

    Resistive-switching memories stacked in a metal–insulator–metal (MIM) like structure have shown great potential for next generation non-volatile memories. In this study, ceria based resistive memory stacks are fabricated by implementing different sputter conditions (temperatures and powers). The films deposited at low temperatures were found to have random grain orientations, less porosity and dense structure. The effect of deposition conditions on resistive switching characteristics of as-prepared films were also investigated. Improved and reliable resistive switching behaviors were achieved for the memory devices occupying less porosity and densely packed structures prepared at low temperatures. Finally, the underlying switching mechanism was also explained on the basis of quantitative analysis.

  20. Failure mechanisms of platinum aluminide bond coat/electron beam-physical vapor deposited thermal barrier coatings

    NASA Astrophysics Data System (ADS)

    Vaidyanathan, Krishnakumar

    Thermal barrier coatings (TBCs) allow operation of structural components, such as turbine blades and vanes in industrial and aircraft gas engines, at temperatures close to the substrate melting temperatures. They consist of four different layers; a high strength creep-resistant nickel-based superalloy substrate, an oxidation resistant bond coat (BC), a low thermal conductivity ceramic topcoat and a thermally grown oxide (TGO), that is predominantly alpha-Al 2O3, that forms between the BC and the TBC. Compressive stresses (3--5 GPa) that are generated in the thin TGO (0.25--8 mum) due to the mismatch in thermal coefficient of expansion between the TGO and BC play a critical role in the failure of these coatings. In this study, the failure mechanisms of a commercial yttria-stabilized zirconia (7YSZ) electron beam-physical vapor deposited (EB-PVD) coating on platinum aluminide (beta-(Ni,Pt)Al) bond coat have been identified. Two distinct mechanisms have been found responsible for the observed damage initiation and progression at the TGO/bond coat interface. The first mechanism leads to localized debonding at TGO/bond coat interface due to increased out-of-plane tensile stress, along bond coat features that manifest themselves as ridges. The second mechanism causes cavity formation at the TGO/bond coat interface, driven by cyclic plasticity of the bond coat. It has been found that the debonding at the TGO/bond coat interface due to the first mechanism is solely life determining. The final failure occurs by crack extension along either the TGO/bond coat interface or the TGO/YSZ interface or a combination of both, leading to large scale buckling. Based on these mechanisms, it is demonstrated that the bond coat grain size and the aspect ratio of the ridges have a profound influence on spallation lives of the coating. The removal of these ridges by fine polishing prior to TBC deposition led to a four-fold improvement in life. The failure mechanism identified for the

  1. Electron Beam Freeform Fabrication

    NASA Video Gallery

    Electron Beam Freeform Fabrication (EBF3) is a process by which NASA hopes to build metal parts in zero gravity environments. It's a layer-additive process that uses an electron beam and a solid wi...

  2. Relativistic electron beam generator

    DOEpatents

    Mooney, L.J.; Hyatt, H.M.

    1975-11-11

    A relativistic electron beam generator for laser media excitation is described. The device employs a diode type relativistic electron beam source having a cathode shape which provides a rectangular output beam with uniform current density.

  3. Electron beam focusing system

    SciTech Connect

    Dikansky, N.; Nagaitsev, S.; Parkhomchuk, V.

    1997-09-01

    The high energy electron cooling requires a very cold electron beam. Thus, the electron beam focusing system is very important for the performance of electron cooling. A system with and without longitudinal magnetic field is presented for discussion. Interaction of electron beam with the vacuum chamber as well as with the background ions and stored antiprotons can cause the coherent electron beam instabilities. Focusing system requirements needed to suppress these instabilities are presented.

  4. Electron beam device

    DOEpatents

    Beckner, E.H.; Clauser, M.J.

    1975-08-12

    This patent pertains to an electron beam device in which a hollow target is symmetrically irradiated by a high energy, pulsed electron beam about its periphery and wherein the outer portion of the target has a thickness slightly greater than required to absorb the electron beam pulse energy. (auth)

  5. Comparative Study of Solid-Phase Crystallization of Amorphous Silicon Deposited by Hot-Wire CVD, Plasma-Enhanced CVD, and Electron-Beam Evaporation

    SciTech Connect

    Stradins, P.; Kunz, O.; Young, D. L.; Yan, Y.; Jones, K. M.; Xu, Y.; Reedy, R. C.; Branz, H. M.; Aberle, A. G.; Wang, Q.

    2007-01-01

    Solid-phase crystallization (SPC) rates are compared in amorphous silicon films prepared by three different methods: hot-wire chemical vapor deposition (HWCVD), plasma-enhanced chemical vapor deposition (PECVD), and electron-beam physical vapor deposition (e-beam). Random SPC proceeds approximately 5 and 13 times slower in PECVD and e-beam films, respectively, as compared to HWCVD films. Doping accelerates random SPC in e-beam films but has little effect on the SPC rate of HWCVD films. In contrast, the crystalline growth front in solid-phase epitaxy experiments propagates at similar speed in HWCVD, PECVD, and e-beam amorphous Si films. This strongly suggests that the observed large differences in random SPC rates originate from different nucleation rates in these materials while the grain growth rates are relatively similar. The larger grain sizes observed for films that exhibit slower random SPC support this suggestion.

  6. Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

    PubMed Central

    Szkudlarek, Aleksandra; Rodrigues Vaz, Alfredo; Zhang, Yucheng; Rudkowski, Andrzej; Kapusta, Czesław; Erni, Rolf; Moshkalev, Stanislav

    2015-01-01

    Summary In this paper we study in detail the post-growth annealing of a copper-containing material deposited with focused electron beam induced deposition (FEBID). The organometallic precursor Cu(II)(hfac)2 was used for deposition and the results were compared to that of compared to earlier experiments with (hfac)Cu(I)(VTMS) and (hfac)Cu(I)(DMB). Transmission electron microscopy revealed the deposition of amorphous material from Cu(II)(hfac)2. In contrast, as-deposited material from (hfac)Cu(I)(VTMS) and (hfac)Cu(I)(DMB) was nano-composite with Cu nanocrystals dispersed in a carbonaceous matrix. After annealing at around 150–200 °C all deposits showed the formation of pure Cu nanocrystals at the outer surface of the initial deposit due to the migration of Cu atoms from the carbonaceous matrix containing the elements carbon, oxygen, and fluorine. Post-irradiation of deposits with 200 keV electrons in a transmission electron microscope favored the formation of Cu nanocrystals within the carbonaceous matrix of freestanding rods and suppressed the formation on their surface. Electrical four-point measurements on FEBID lines from Cu(hfac)2 showed five orders of magnitude improvement in conductivity when being annealed conventionally and by laser-induced heating in the scanning electron microscope chamber. PMID:26425404

  7. (Pulsed electron beam precharger)

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1990-01-01

    This report discusses the following topics on electron beam guns: Precharger Modification; Installation of Charge vs. Radius Apparatus; High Concentration Aerosol Generation; and Data Acquisition and Analysis System.

  8. Conductance enhancement due to interface magnons in electron-beam evaporated MgO magnetic tunnel junctions with CoFeB free layer deposited at different pressure

    SciTech Connect

    Guo, P.; Yu, G. Q.; Wei, H. X.; Han, X. F. E-mail: xfhan@aphy.iphy.ac.cn; Li, D. L.; Feng, J. F. E-mail: xfhan@aphy.iphy.ac.cn; Kurt, H.; Chen, J. Y.; Coey, J. M. D.

    2014-10-21

    Electron-beam evaporated MgO-based magnetic tunnel junctions have been fabricated with the CoFeB free layer deposited at Ar pressure from 1 to 4 mTorr, and their tunneling process has been studied as a function of temperature and bias voltage. By changing the growth pressure, the junction dynamic conductance dI/dV, inelastic electron tunneling spectrum d²I/dV², and tunneling magnetoresistance vary with temperature. Moreover, the low-energy magnon cutoff energy E{sub C} derived from the conductance versus temperature curve agrees with interface magnon energy obtained directly from the inelastic electron tunneling spectrum, which demonstrates that interface magnons are involved in the electron tunneling process, opening an additional conductance channel and thus enhancing the total conductance.

  9. Pr and F co-doped SnO₂ transparent conductive films with high work function deposited by ion-assisted electron beam evaporation.

    PubMed

    Wu, Shaohang; Li, Yantao; Luo, Jinsong; Lin, Jie; Fan, Yi; Gan, Zhihong; Liu, Xingyuan

    2014-02-24

    A transparent conductive oxide (TCO) Pr and F co-doped SnO2 (PFTO) film is prepared by ion-assisted electron beam deposition. An optimized PFTO film shows a high average visible optical transmittance of 83.6% and a minimum electrical resistivity of 3.7 × 10(-3) Ω·cm corresponding to a carrier density of 1.298 × 10(20) cm(-3) and Hall mobility of 12.99 cm(2)/V⋅s. This PFTO film shows a high work function of 5.147 eV and favorable surface morphology with an average roughness of 1.45 nm. Praseodymium fluoride is found to be an effective material to dope F into SnO2 that can simplify the fabrication process of SnO2-based TCO films. PMID:24663792

  10. Effect of deposition temperature on electron-beam evaporated polycrystalline silicon thin-film and crystallized by diode laser

    SciTech Connect

    Yun, J. Varalmov, S.; Huang, J.; Green, M. A.; Kim, K.

    2014-06-16

    The effects of the deposition temperature on the microstructure, crystallographic orientation, and electrical properties of a 10-μm thick evaporated Si thin-film deposited on glass and crystallized using a diode laser, are investigated. The crystallization of the Si thin-film is initiated at a deposition temperature between 450 and 550 °C, and the predominant (110) orientation in the normal direction is found. Pole figure maps confirm that all films have a fiber texture and that it becomes stronger with increasing deposition temperature. Diode laser crystallization is performed, resulting in the formation of lateral grains along the laser scan direction. The laser power required to form lateral grains is higher in case of films deposited below 450 °C for all scan speeds. Pole figure maps show 75% occupancies of the (110) orientation in the normal direction when the laser crystallized film is deposited above 550 °C. A higher density of grain boundaries is obtained when the laser crystallized film is deposited below 450 °C, which limits the solar cell performance by n = 2 recombination, and a performance degradation is expected due to severe shunting.

  11. Nano-indentation of single-layer optical oxide thin films grown by electron-beam deposition

    SciTech Connect

    Mehrotra, K.; Oliver, J. B.; Lambropoulos, J. C.

    2015-01-01

    Mechanical characterization of optical oxide thin films is performed using nano-indentation, and the results are explained based on the deposition conditions used. These oxide films are generally deposited to have a porous microstructure that optimizes laser induced damage thresholds, but changes in deposition conditions lead to varying degrees of porosity, density, and possibly the microstructure of the thin film. This can directly explain the differences in the mechanical properties of the film studied here and those reported in literature. Of the four single-layer thin films tested, alumina was observed to demonstrate the highest values of nano-indentation hardness and elastic modulus. This is likely a result of the dense microstructure of the thin film arising from the particular deposition conditions used.

  12. Microstructural analysis and transport properties of MoO and MoC nanostructures prepared by focused electron beam-induced deposition.

    PubMed

    Makise, Kazumasa; Mitsuishi, Kazutaka; Shimojo, Masayuki; Shinozaki, Bunju

    2014-01-01

    By electron-beam-induced deposition, we have succeeded in the direct fabrication of nanowires of molybdenum oxide (MoOx) and molybdenum carbide (MoC) on a SiO2 substrate set in a scanning electron microscope. In order to prepare MoOx specimens of high purity, a precursor gas of molybdenum hexacarbonyl [Mo(CO)6] is used, mixed with oxygen gas. On the other hand, MoC is grown by mixing H2O gas with the precursor gas. The electrical transport properties of the nanowires are investigated by the DC four-terminal method. A highly resistive MoOx nanowire prepared from an as-deposited specimen by annealing in air shows nonlinear current-voltage characteristics and a high photoconductivity. The resistivity ρ of an as-deposited amorphous MoC (a-MoC) nanowire takes its maximum at a temperature T ≈ 10 K and decreases to ≈ 0 with decreasing temperature. This behavior of ρ(T) indicates the possible occurrence of superconductivity in a-MoC nanowires. The characteristic of ρ(T) below the superconducting transition temperature Tc ≈ 4 K can be well explained by the quantum phase-slip model with a coherence length ξ(0) ≈ 8 nm at T = 0.

  13. Electron Induced Surface Reactions of cis-Pt(CO)2Cl2: A Route to Focused Electron Beam Induced Deposition of Pure Pt Nanostructures.

    PubMed

    Spencer, Julie A; Wu, Yung-Chien; McElwee-White, Lisa; Fairbrother, D Howard

    2016-07-27

    Using mechanistic data from surface science studies on electron-induced reactions of organometallic precursors, cis-Pt(CO)2Cl2 (1) was designed specifically for use in focused electron beam induced deposition (FEBID) of Pt nanostructures. Electron induced decomposition of adsorbed 1 under ultrahigh vacuum (UHV) conditions proceeds through initial CO loss as determined by in situ X-ray photoelectron spectroscopy and mass spectrometry. Although the Pt-Cl bonds remain intact during the initial decomposition step, larger electron doses induce removal of the residual chloride through an electron-stimulated desorption process. FEBID structures created from cis-Pt(CO)2Cl2 under steady state deposition conditions in an Auger spectrometer were determined to be PtCl2, free of carbon and oxygen. Coupled with the electron stimulated removal of chlorine demonstrated in the UHV experiments, the Auger deposition data establish a route to FEBID of pure Pt. Results from this study demonstrate that structure-activity relationships can be used to design new precursors specifically for FEBID.

  14. Inclined Substrate Deposited CeO2 Films by Electron Beam Evaporation on Randomly Oriented Metallic Substrate

    NASA Astrophysics Data System (ADS)

    Mancini, A.; Celentano, G.; Fabbri, F.; Galluzzi, V.; Petrisor, T.; Rufoloni, A.; Varesi, E.; Vannozzi, A.; Rogai, R.; Boffa, V.; Gambardella, U.

    A study on CeO2 film growth on randomly oriented metallic substrate using lnclined Substrate Deposition (ISD) technique was performed in order to develop a biaxially aligned buffer layer for YBa2Cu3O7-δ (YBCO) coated conductors. The influence of deposition parameters, as the substrate inclination angle α with respect to the CeO2 vapor direction, deposition temperature and film thickness, on structural and morphological properties of the film was investigated. At substrate temperature between 200°C and 700°C a biaxial texture was observed for α ranging from 150° to 75°. The minimum value of the φ-scan full width at half maximum (FWHM) on (002) poles of about 13.5° was obtained for film 2 μm thick deposited at 200°C and α=55°. Morphological analyses on cross-sectioned samples revealed a columnar structure, typical for this deposition technique, with spaced grains and a tile like surface.

  15. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Electron beam precharging of a high resistivity aerosol was successfully performed under a range of experimental conditions during Quarter Six of the contract. The initial E-beam particle precharging experiments completed this term were designed to extend the efficiency of particle charging and collection using a fine, monodisperse aerosol at relatively large loadings in the FSU Electron Beam Precipitator wind tunnel. There are several reasons for doing this: (1) to re-establish a baseline performance criterion for comparison to other runs, (2) to test several recently upgraded or repaired subsystems, and (3) to improve upon the collection efficiency of the electron beam precipitator when testing precharging effectiveness with a very high resistivity, moderate-to-high dust concentration. In addition, these shakedown runs were used to determine a set of suitable operational parameters for the wind tunnel, the electrostatic collecting sections, and the MINACC E-beam accelerator. These parameters will normally be held constant while the precharging parameters are varied to produce an optimum particle charge. The electron beam precharging investigation performed during the period covered by Quarter Six used virtually the same experimental apparatus and procedures as in previous contract work, and these are described for review in this report. This investigation was part of an experimental effort which ran nearly continuously for nine months, encompassing work on the electrostatic collecting section, electron beam precharger, and particle charge-to-radius measuring apparatus. A summary of the work on dc electron beam precipitation is presented here.

  16. A comparative study of the electrical properties of Pd/ZnO Schottky contacts fabricated using electron beam deposition and resistive/thermal evaporation techniques

    SciTech Connect

    Mtangi, W.; Auret, F. D.; Janse van Rensburg, P. J.; Coelho, S. M. M.; Legodi, M. J.; Nel, J. M.; Meyer, W. E.; Chawanda, A.

    2011-11-01

    A systematic investigation to check the quality of Pd Schottky contacts deposited on ZnO has been performed on electron beam (e-beam) deposited and resistively/thermally evaporated samples using current-voltage, IV, and conventional deep level transient spectroscopy (DLTS) measurements. Room temperature IV measurements reveal the dominance of pure thermionic emission on the resistively evaporated contacts, while the e-beam deposited contacts show the dominance of generation recombination at low voltages, <0.30 V, and the dominance of pure thermionic emission at high voltages, greater than 0.30 V. The resistively evaporated contacts have very low reverse currents of the order of 10{sup -10} A at a reverse voltage of 1.0 V whereas the e-beam deposited contacts have reverse currents of the order of 10{sup -6} A at 1.0 V. Average ideality factors have been determined as (1.43 {+-} 0.01) and (1.66 {+-} 0.02) for the resistively evaporated contacts and e-beam deposited contacts, respectively. The IV barrier heights have been calculated as (0.721 {+-} 0.002) eV and (0.624 {+-} 0.005) eV for the resistively evaporated and e-beam deposited contacts, respectively. Conventional DLTS measurements reveal the presence of three prominent defects in both the resistive and e-beam contacts. Two extra peaks with energy levels of 0.60 and 0.81 eV below the conduction band minimum have been observed in the e-beam deposited contacts. These have been explained as contributing to the generation recombination current that dominates at low voltages and high leakage currents. Based on the reverse current at 1.0 V, the degree of rectification, the dominant current transport mechanism and the observed defects, we conclude that the resistive evaporation technique yields better quality Schottky contacts for use in solar cells and ultraviolet detectors compared to the e-beam deposition technique. The 0.60 eV has been identified as possibly related to the unoccupied level for the doubly charged

  17. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1990-01-01

    Electrostatic collection of a high resistivity aerosol using the Electron Beam Precipitator (EBP) collecting section was demonstrated during this reporting period (Quarter Five). Collection efficiency experiments were designed to confirm and extend some of the work performed under the previous contract. The reason for doing this was to attempt to improve upon the collection efficiency of the precipitator alone when testing with a very high resistivity, moderate-to-high concentration dust load. From the collector shakedown runs, a set of suitable operational parameters were determined for the downstream electrostatic collecting sections of the Electron Beam Precipitator wind tunnel. These parameters, along with those for the MINACC electron beam, will generally be held constant while the numerous precharging parameters are varied to produce an optimum particle charge. The electrostatic collector experiments were part of a larger, comprehensive investigation on electron beam precharging of high resistivity aerosol particles performed during the period covered by Quarters Five, Six, and Seven. This body of work used the same experimental apparatus and procedures and the experimental run period lasted nearly continuously for six months. A summary of the Quarter Five work is presented in the following paragraphs. Section II-A of TPR 5 contains a report on the continuing effort which was expended on the modification and upgrade of the pulsed power supply and the monitoring systems prior to the initiation of the electron beam precharging experimental work.

  18. Identification and roles of nonstoichiometric oxygen in amorphous Ta2O5 thin films deposited by electron beam and sputtering processes

    NASA Astrophysics Data System (ADS)

    Mannequin, Cedric; Tsuruoka, Tohru; Hasegawa, Tsuyoshi; Aono, Masakazu

    2016-11-01

    The morphology and composition of tantalum oxide (Ta2O5) thin films prepared by electron-beam (EB) evaporation and radio-frequency sputtering (SP) were investigated by grazing incidence X-ray diffraction (GIXRD), X-ray reflectometry (XRR), atomic force microscopy, Fourier transformed infrared spectroscopy (FTIR), and X-ray photoelectron spectroscopy (XPS). GIXRD revealed an amorphous nature for both films, and XRR showed that the density of the Ta2O5-EB films was lower than that of the Ta2O5-SP films; both films have lower density than the bulk value. A larger amount of molecular water and peroxo species were detected for the Ta2O5-EB films by FTIR performed in ambient atmosphere. XPS analyses performed in vacuum confirmed the presence of hydroxyl groups, but no trace of chemisorbed molecular water was detected. In addition, a higher oxygen nonstoichiometry (higher O/Ta ratio) was found for the EB films. From these results, we conclude that the oxygen nonstoichiometry of the EB film accounted for its lower density and higher amount of absorbed molecular water. The results also suggest the importance of understanding the dependence of the structural and chemical properties of thin amorphous oxide films on the deposition process.

  19. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

    PubMed Central

    Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert

    2015-01-01

    Summary Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  20. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition.

    PubMed

    Rodríguez, Luis A; Deen, Lorenz; Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert; De Teresa, José M

    2015-01-01

    Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID.

  1. Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition.

    PubMed

    Rodríguez, Luis A; Deen, Lorenz; Córdoba, Rosa; Magén, César; Snoeck, Etienne; Koopmans, Bert; De Teresa, José M

    2015-01-01

    Iron nanostructures grown by focused electron beam induced deposition (FEBID) are promising for applications in magnetic sensing, storage and logic. Such applications require a precise design and determination of the coercive field (H C), which depends on the shape of the nanostructure. In the present work, we have used the Fe2(CO)9 precursor to grow iron nanowires by FEBID in the thickness range from 10 to 45 nm and width range from 50 to 500 nm. These nanowires exhibit an Fe content between 80 and 85%, thus giving a high ferromagnetic signal. Magneto-optical Kerr characterization indicates that H C decreases for increasing thickness and width, providing a route to control the magnetization reversal field through the modification of the nanowire dimensions. Transmission electron microscopy experiments indicate that these wires have a bell-type shape with a surface oxide layer of about 5 nm. Such features are decisive in the actual value of H C as micromagnetic simulations demonstrate. These results will help to make appropriate designs of magnetic nanowires grown by FEBID. PMID:26199835

  2. Landsat electron beam recorder

    NASA Astrophysics Data System (ADS)

    Grosso, P. F.; Whitley, J. P.

    A minicomputer-controlled electron beam recorder (EBR) presently in use at the Brazilian Government's Institute De Pesquisas Espaclais (INPE) satellite ground station is described. This 5-in.-film-size EBR is used to record both Landsat and SPOT satellite imagery in South America. A brief electron beam recorder technology review is presented. The EBR is capable of recording both vector and text data from computer-aided design, publishing, and line art systems and raster data from image scanners, raster image processors (RIPS), halftone/screen generators, and remote image sensors. A variety of image formats may be recorded on numerous film sizes (16 mm, 35 mm, 70 mm, 105 mm, 5-in, 5.5-in., and 9.5-in.). These recordings are used directly or optically enlarged depending on the final product.

  3. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Electron beam precharging of a high resistivity aerosol was successfully demonstrated during this reporting period (Quarters Five and Six). The initial E-beam particle precharging experiments completed this term were designed to confirm and extend some of the work performed under the previous contract. There are several reasons for doing this: (1) to re-establish a baseline performance criterion for comparison to other runs, (2) to test several recently upgraded or repaired subsystems, and (3) to improve upon the collection efficiency of the electron beam precipitator when testing precharging effectiveness with a very high resistivity, moderate-to-high concentration dust load. In addition, these shakedown runs were used to determine a set of suitable operational parameters for the wind tunnel, the electrostatic collecting sections, and the MINACC E-beam accelerator. These parameters will generally be held constant while the precharging parameters are varied to produce an optimum particle charge.

  4. Measuring electron beam polarization

    NASA Astrophysics Data System (ADS)

    Napolitano, J.

    1992-12-01

    A two-hour discussion session was held on electron beam polarimetry including representatives from Halls A, B, and C. Presentations included a description of an existing Mo/ller polarimeter at the MIT-Bates laboratory, plans for Mo/ller polarimeters in Halls A and B, and a Compton (i.e., ``laser backscatter'') polarimeter planned for Hall A. This paper is a summary of those discussions.

  5. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    During the previous reporting period (Quarter Six), the charging and removal of a fine, high resistivity aerosol using the advanced technology of electron beam precipitation was successfully accomplished. Precharging a dust stream circulating through the EBP wind tunnel produced collection efficiency figures of up to 40 times greater than with corona charging and collection alone (Table 1). The increased system collection efficiency attributed to electron beam precharging was determined to be the result of increased particle charge. It was found that as precharger electric field was raised, collection efficiency became greater. In sequence, saturation particle charge varies with the precharger electric field strength, particle migration velocity varies with the precharger and collector electric field, and collection efficiency varies with the migration velocity. Maximizing the system collection efficiency requires both a high charging electric field (provided by the E-beam precharger), and a high collecting electric field (provided by the collector wires and plates). Because increased particle collection efficiency is directly attributable to higher particle charge, the focus of research during Quarter Seven was shifted to learning more about the actual charge magnitude on the aerosol particles. Charge determinations in precipitators have traditionally been made on bulk dust samples collected from the flue gas stream, which gives an overall charge vs. mass (Q/M) ratio measurement. More recently, techniques have been developed which allow the measurement of the charge on individual particles in a rapid and repeatable fashion. One such advanced technique has been developed at FSU for use in characterizing the electron beam precharger.

  6. Plasma and ion barrier for electron beam spot stability

    SciTech Connect

    Kwan, Thomas J. T.; Snell, Charles M.

    2000-03-01

    High-current electron beams of small spot size are used for high-resolution x-ray radiography of dense objects. Intense energy deposition in the bremsstrahlung target causes generation of ions which can propagate upstream and disrupt the electron beam. We have investigated the use of a thin beryllium foil placed 1-2 cm in front of the target, which serves as a barrier for the ions but is essentially transparent to the incoming electron beam. Analysis and computer simulations confirm that this confinement method will halt ion propagation and preserve the spot size stability of the electron beam. (c) 2000 American Institute of Physics.

  7. Electron Beam Emission Characteristics from Plasma Focus Devices

    NASA Astrophysics Data System (ADS)

    Zhang, T.; Patran, A.; Wong, D.; Hassan, S. M.; Springham, S. V.; Tan, T. L.; Lee, P.; Lee, S.; Rawat, R. S.

    2006-01-01

    In this paper we observed the characteristics of the electron beam emission from our plasma focus machine filling neon, argon, helium and hydrogen. Rogowski coil and CCD based magnetic spectrometer were used to obtain temporal and energy distribution of electron emission. And the preliminary results of deposited FeCo thin film using electron beam from our plasma focus device were presented.

  8. T-3 electron-beam-excited laser system

    SciTech Connect

    Klein, R A

    1981-02-01

    A laser system specifically designed to study the kinetics of electron-beam driven systems is described. Details of the system are given along with measurements of the electron-beam uniformity and deposition in the laser medium. Some HF laser results obtained with this system are also given.

  9. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1990-01-01

    Florida State University is investigating the concept of pulsed electron beams for fly ash precipitation. This report describes the results and data on three of the subtasks of this project and preliminary work only on the remaining five subtasks. Described are the modification of precharger for pulsed and DC energization of anode; installation of the Q/A measurement system; and modification and installation of pulsed power supply to provide both pulsed and DC energization of the anode. The other tasks include: measurement of the removal efficiency for monodisperse simulated fly ash particles; measurement of particle charge; optimization of pulse energization schedule for maximum removal efficiency; practical assessment of results; and measurement of the removal efficiency for polydisperse test particles. 15 figs., 1 tab. (CK)

  10. Compact electron beam focusing column

    SciTech Connect

    Persaud, Arun; Leung, Ka-Ngo; Reijonen, Jani

    2001-07-13

    A novel design for an electron beam focusing column has been developed at LBNL. The design is based on a low-energy spread multicusp plasma source which is used as a cathode for electron beam production. The focusing column is 10 mm in length. The electron beam is focused by means of electrostatic fields. The column is designed for a maximum voltage of 50 kV. Simulations of the electron trajectories have been performed by using the 2-D simulation code IGUN and EGUN. The electron temperature has also been incorporated into the simulations. The electron beam simulations, column design and fabrication will be discussed in this presentation.

  11. Electron beam polarimetry

    NASA Astrophysics Data System (ADS)

    Sinclair, Charles K.

    1998-12-01

    Along with its well known charge and mass, the electron also carries an intrinsic angular momentum, or spin. The rules of quantum mechanics allow us to measure only the probability that the electron spin is in one of two allowed spin states. When a beam carries a net excess of electrons in one of these two allowed spin states, the beam is said to be polarized. The beam polarization may be measured by observing a sufficient number of electrons scattered by a spin-dependent interaction. For electrons, the useful scattering processes involve Coulomb scattering by heavy nuclei, or scattering from either polarized photons or other polarized electrons (known as Mott, Compton, and Mo/ller scattering, respectively). In this tutorial, we will briefly review how beam polarization is measured through a general scattering process, followed by a discussion of how the three scattering processes above are used to measure electron beam polarization. Descriptions of electron polarimeters based on the three scattering processes will be given.

  12. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Quarter Eight of the Pulsed Electron Precharging project was principally devoted to the operation of the E-beam precharger in the pulsed anode mode. We shall first briefly review the motivation for carrying out this project and the experimental approach used. The combustion of low sulfur coal for the purpose of generating electric energy in power plants results in the production of a flue gas containing very high resistivity fly ash. This fly ash is not easily collected by conventional electrostatic precipitators due to the large electric potential difference which develops across the layer of fly ash on the collector plate. If this layer of collected material is allowed to reach a thickness as great as is normally desirable before rapping'' the plates, then the collected fly ash is subject to re-entrainment into the flue gas stream due to back-corona. The back-corona corona problem is described more fully in the next section of this report. This re-entrainment problem can be eliminated through reduction of the voltage applied across the high voltage wires and the grounded plates of the electrostatic precipitator. This is not a good solution to the problem since the charging capability and collection efficiency of the precipitator system are both greatly reduced at the low voltages required to avoid the back-corona problem. Another approach to solving the problems inherent in collecting high resistivity fly ash in an electrostatic precipitator is to decouple the charging and collecting functions. At FSU an electron beam precharger is employed directly before (upstream in the flue gas pathway) the precipitator. This precharger can be optimized for the charging function while the downstream collector can be optimized for collection of the high-resistivity fly ash.

  13. Pulsed electron beam precharger

    SciTech Connect

    Finney, W.C.; Shelton, W.N.

    1991-01-01

    Quarter Nine of the Pulsed Electron Precharging project was principally devoted to reviewing and interpreting the experimental results obtained during the past eight quarters of the project. We shall first briefly review the motivation for carrying out this project and the experimental approach used. The combustion of low sulfur coal for the purpose of generating electric energy in power plants results in the production of a flue gas containing very high resistivity fly ash. This fly ash is not easily collected by conventional electrostatic precipitators due to the large electric potential difference which develops across the layer of fly ash on the collector plate. If this layer of collected material is allowed to reach a thickness as great as is nominally desirable before rapping'' the plates, then the collected fly ash is subject to re-entrainment into the flue gas stream due to back-corona. The back-corona corona problem is described more fully in the next section of this report. This re-entrainment problem can be eliminated through reduction of the voltage applied across the high voltage wires and the grounded plates of the electrostatic precipitator. This is not a good solution to the problem since the charging capability and collection efficiency of the precipitator system are both greatly reduced at the low voltages and resultant small corona currents required to avoid the back-corona problem. Another approach to solving the problems inherent in collecting high resistivity fly ash in an electrostatic precipitator is to decouple the charging and collecting functions. At FSU an electron beam precharger is employed directly before (upstream in the flue gas pathway) the precipitator.

  14. Nano-granulization of gadolinia-doped ceria electrolyte surface by aerosol-assisted chemical vapor deposition for low-temperature solid oxide fuel cells

    NASA Astrophysics Data System (ADS)

    Kim, Jun Woo; Jang, Dong Young; Kim, Manjin; Choi, Hyung Jong; Shim, Joon Hyung

    2016-01-01

    We have fabricated nano-scale gadolinia-doped ceria (GDC) at the electrode-electrolyte boundary by aerosol-assisted chemical vapor deposition (AACVD) for high-performance solid oxide fuel cells (SOFCs) working at low temperatures below 500 °C. In AACVD, temperature is the key factor affecting the grain size. We have confirmed that by nano-granulizing the electrolyte surface using optimized AACVD, the power output of the SOFC is 50% higher than that of the bare GDC SOFC. From the impedance analysis, significant enhancement of the cathodic oxygen reduction reaction is identified from the AACVD-GDC nano-grain surface treatment.

  15. Electron beams in solar flares

    NASA Technical Reports Server (NTRS)

    Aschwanden, Markus J.; Dennis, Brian R.; Benz, Arnold O.

    1994-01-01

    A list of publications resulting from this program includes 'The Timing of Electron Beam Signatures in Hard X-Ray and Radio: Solar Flare Observations by BATSE/Compton Gamma-Ray Observatory and PHOENIX'; 'Coherent-Phase or Random-Phase Acceleration of Electron Beams in Solar Flares'; 'Particle Acceleration in Flares'; 'Chromospheric Evaporation and Decimetric Radio Emission in Solar Flares'; 'Sequences of Correlated Hard X-Ray and Type 3 Bursts During Solar Flares'; and 'Solar Electron Beams Detected in Hard X-Rays and Radiowaves.' Abstracts and reprints of each are attached to this report.

  16. Electron cooling of electron beams

    SciTech Connect

    Larson, D.J.

    1993-09-01

    Electron cooling of electron (and positron) sources may be important for future linear collider applications. In order to cool electrons with electrons, an intermediary positron beam must be employed, since it is impossible to merge two beams of identical particles into the cooling straight. By adjusting the beta functions of the electron and positron lattices appropriately, the final emittance of the stored electron beam can be made less than the emittance of the cooling electron beam. This paper will discuss accelerator physics issues relating to an electron-cooled electron beam source.

  17. Composite ceria-coated aerogels and methods of making the same

    DOEpatents

    Eyring, Edward M; Ernst, Richard D; Turpin, Gregory C; Dunn, Brian C

    2013-05-07

    Ceria-coated aerogels can include an aerogel support material having a stabilized ceria coating thereon. The ceria coating can be formed by solution or vapor deposition of alcogels or aerogels. Additional catalytic metal species can also be incorporated into the coating to form multi-metallic compounds having improved catalytic activity. Further, the ceria coated aerogels retain high surface areas at elevated temperatures. Thus, improvements in catalytic activity and thermal stability can be achieved using these ceria-coated composite aerogels.

  18. WEBEXPIR: Windowless target electron beam experimental irradiation

    NASA Astrophysics Data System (ADS)

    Dierckx, Marc; Schuurmans, Paul; Heyse, Jan; Rosseel, Kris; Van Tichelen, Katrien; Nactergal, Benoit; Vandeplassche, Dirk; Aoust, Thierry; Abs, Michel; Guertin, Arnaud; Buhour, Jean-Michel; Cadiou, Arnaud; Abderrahim, Hamid Aït

    2008-06-01

    The windowless target electron beam experimental irradiation (WEBEXPIR) program was set-up as part of the MYRRHA/XT-ADS R&D effort on the spallation target design to investigate the interaction of a proton beam with a liquid lead-bismuth eutectic (LBE) free surface. In particular, possible free surface distortion or shockwave effects in nominal conditions and during sudden beam on/off transient situations, as well as possible enhanced evaporation were assessed. An experiment was conceived at the IBA TT-1000 Rhodotron, where a 7 MeV electron beam was used to simulate the high power deposition at the MYRRHA/XT-ADS LBE free surface. The geometry and the LBE flow characteristics in the WEBEXPIR set-up were made as representative as possible of the actual situation in the MYRRHA/XT-ADS spallation target. Irradiation experiments were carried out at beam currents of up to 10 mA, corresponding to 40 times the nominal beam current necessary to reproduce the MYRRHA/XT-ADS conditions. Preliminary analyses show that the WEBEXPIR free surface flow was not disturbed by the interaction with the electron beam and that vacuum conditions stayed well within the design specifications.

  19. Electron beam ion source and electron beam ion trap (invited)

    SciTech Connect

    Becker, Reinard; Kester, Oliver

    2010-02-15

    The electron beam ion source (EBIS) and its trap variant [electron beam ion trap (EBIT)] celebrated their 40th and 20th anniversary, respectively, at the EBIS/T Symposium 2007 in Heidelberg. These technologically challenging sources of highly charged ions have seen a broad development in many countries over the last decades. In contrast to most other ion sources the recipe of improvement was not ''sorcery'' but a clear understanding of the physical laws and obeying the technological constraints. This review will report important achievements of the past as well as promising developments in the future.

  20. The effect of Ag diffusion on properties of YBa 2Cu 3O 7- x thin films produced by electron beam deposition techniques

    NASA Astrophysics Data System (ADS)

    Görür, O.; Küçükömeroğlu, T.; Terzioğlu, C.; Varilci, A.; Altunbaş, M.

    2005-01-01

    Superconducting YBa 2Cu 3O 7- x thin films were prepared on pure MgO and Ag/MgO substrates (without and with Ag buffer layer) using an electron beam evaporation technique. The effects of isothermal annealing temperature and Ag diffusion on the crystalline structure and some superconducting properties were investigated by X-ray diffraction, scanning electron microscopy, critical temperature, critical current density and room temperature resistivity measurements. The optimum annealing conditions causing a high degree of preferential orientation with the c-axis perpendicular to the substrates were found to be the isothermal annealing at 930 °C for 5 h. Annealing of films on Ag/MgO substrates is accompanied by Ag diffusion from the buffer layer into YBCO films. The higher rate of crystallization of the YBCO films, the higher degree of c-axis orientation, the higher dense surface morphology, the increased lattice parameter c (by ≈0.1%), the reduced room temperature resistivity (2-3 times), the slightly enchanced critical temperature ( Tc = 92 K at R = 0) and the critical current density ( Jc = 4.2 × 10 5 A/cm 2 at 77 K) were observed for the Ag-doped films (on Ag/MgO substrates) in comparison with those for the undoped films (on MgO substrates). The temperature dependence of the Ag diffusion coefficient in YBCO films in the range 600-800 °C was described by the relation D = 1.9 × 10 -6 exp(-0.73 eV/kT).

  1. Electron beam pumped semiconductor laser

    NASA Technical Reports Server (NTRS)

    Hug, William F. (Inventor); Reid, Ray D. (Inventor)

    2009-01-01

    Electron-beam-pumped semiconductor ultra-violet optical sources (ESUVOSs) are disclosed that use ballistic electron pumped wide bandgap semiconductor materials. The sources may produce incoherent radiation and take the form of electron-beam-pumped light emitting triodes (ELETs). The sources may produce coherent radiation and take the form of electron-beam-pumped laser triodes (ELTs). The ELTs may take the form of electron-beam-pumped vertical cavity surface emitting lasers (EVCSEL) or edge emitting electron-beam-pumped lasers (EEELs). The semiconductor medium may take the form of an aluminum gallium nitride alloy that has a mole fraction of aluminum selected to give a desired emission wavelength, diamond, or diamond-like carbon (DLC). The sources may be produced from discrete components that are assembled after their individual formation or they may be produced using batch MEMS-type or semiconductor-type processing techniques to build them up in a whole or partial monolithic manner, or combination thereof.

  2. Electron Beam Diagnostics in Plasmas Based on Electron Beam Ionization

    NASA Astrophysics Data System (ADS)

    Leonhardt, Darrin; Leal-Quiros, Edbertho; Blackwell, David; Walton, Scott; Murphy, Donald; Fernsler, Richard; Meger, Robert

    2001-10-01

    Over the last few years, electron beam ionization has been shown to be a viable generator of high density plasmas with numerous applications in materials modification. To better understand these plasmas, we have fielded electron beam diagnostics to more clearly understand the propagation of the beam as it travels through the background gas and creates the plasma. These diagnostics vary greatly in sophistication, ranging from differentially pumped systems with energy selective elements to metal 'hockey pucks' covered with thin layers of insulation to electrically isolate the detector from the plasma but pass high energy beam electrons. Most importantly, absolute measurements of spatially resolved beam current densities are measured in a variety of pulsed and continuous beam sources. The energy distribution of the beam current(s) will be further discussed, through experiments incorporating various energy resolving elements such as simple grids and more sophisticated cylindrical lens geometries. The results are compared with other experiments of high energy electron beams through gases and appropriate disparities and caveats will be discussed. Finally, plasma parameters are correlated to the measured beam parameters for a more global picture of electron beam produced plasmas.

  3. Shimmed electron beam welding process

    DOEpatents

    Feng, Ganjiang; Nowak, Daniel Anthony; Murphy, John Thomas

    2002-01-01

    A modified electron beam welding process effects welding of joints between superalloy materials by inserting a weldable shim in the joint and heating the superalloy materials with an electron beam. The process insures a full penetration of joints with a consistent percentage of filler material and thereby improves fatigue life of the joint by three to four times as compared with the prior art. The process also allows variable shim thickness and joint fit-up gaps to provide increased flexibility for manufacturing when joining complex airfoil structures and the like.

  4. The effect of Si content on structure and mechanical features of silicon-containing calcium-phosphate-based films deposited by RF-magnetron sputtering on titanium substrate treated by pulsed electron beam

    NASA Astrophysics Data System (ADS)

    Surmeneva, M.; Tyurin, A.; Mukhametkaliyev, T.; Teresov, A.; Koval, A.; Pirozhkova, T.; Shuvarin, I.; Chudinova, E.; Surmenev, R.

    2015-11-01

    Silicon-containing calcium phosphate (Si-CaP) coatings were fabricated by radio frequency (rf) magnetron sputtering using the targets prepared from hydroxyapatite (HA) powder with different silicon content. A powder of Si-HA (Ca10(PO4)6-x(SiO4)x(OH)2-x, x=0.5 and 1.72) was prepared by mechanochemical activation and then used as a precursor-powder to prepare a target for sputtering. The titanium substrate was acid etched and treated with pulsed electron beam with an energy density of 15 J/cm2. The average crystallite size as determined by XRD was 28 nm for the coatings obtained using the target prepared from the Si-HA powder (x=0.5), whereas Si-CaP (Si-HA powder x=1.72) films showed an amorphous structure. The nanohardness and the Young's modulus of the Si-CaP coating (x=0.5) deposited on titanium treated by pulsed electron beam are enhanced to 4.5 and 113 GPa compared to titanium substrate. Increase of Si content resulted in a dramatic decrease of the nanohardness and Young's modulus of Si-CaP films. However, Si-CaP coatings with the highest Si content revealed significantly lower values of elastic modulus, but slightly higher values of H/E and H3/E2 than did the non-coated specimens. Rf-magnetron sputtering allowed us to produce Si- CaP coatings with higher nanohardness and lower elastic modulus compared to titanium substrate.

  5. Control and enhancement of the oxygen storage capacity of ceria films by variation of the deposition gas atmosphere during pulsed DC magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Eltayeb, Asmaa; Vijayaraghavan, Rajani K.; McCoy, Anthony; Venkatanarayanan, Anita; Yaremchenko, Aleksey A.; Surendran, Rajesh; McGlynn, Enda; Daniels, Stephen

    2015-04-01

    In this study, nanostructured ceria (CeO2) films are deposited on Si(100) and ITO coated glass substrates by pulsed DC magnetron sputtering using a CeO2 target. The influence on the films of using various gas ambients, such as a high purity Ar and a gas mixture of high purity Ar and O2, in the sputtering chamber during deposition are studied. The film compositions are studied using XPS and SIMS. These spectra show a phase transition from cubic CeO2 to hexagonal Ce2O3 due to the sputtering process. This is related to the transformation of Ce4+ to Ce3+ and indicates a chemically reduced state of CeO2 due to the formation of oxygen vacancies. TGA and electrochemical cyclic voltammetry (CV) studies show that films deposited in an Ar atmosphere have a higher oxygen storage capacity (OSC) compared to films deposited in the presence of O2. CV results specifically show a linear variation with scan rate of the anodic peak currents for both films and the double layer capacitance values for films deposited in Ar/O2 mixed and Ar atmosphere are (1.6 ± 0.2) × 10-4 F and (4.3 ± 0.5) × 10-4 F, respectively. Also, TGA data shows that Ar sputtered samples have a tendency to greater oxygen losses upon reduction compared to the films sputtered in an Ar/O2 mixed atmosphere.

  6. Intermediate-Temperature Solid-Oxide Fuel Cells with a Gadolinium-Doped Ceria Anodic Functional Layer Deposited via Radio-Frequency Sputtering.

    PubMed

    Tanveer, Waqas Hassan; Ji, Sanghoon; Yu, Wonjong; Cho, Gu Young; Lee, Yoon Ho; Cha, Suk Won

    2015-11-01

    We investigated the effects of the insertion of a gadolinium-doped ceria (GDC) anodic functional layer (AFL) on the electrochemical performance of intermediate-temperature solid-oxide fuel cells (SOFCs). Fully stabilized yttria-stabilized zirconia (YSZ) was used as an oxygen-ion-conducting and support material. Nickel-Samaria-doped ceriathin film was used as an anode material, while screen-printed lanthanum strontium magnetite served as a cathode material. In order to enhance the interfacial reaction on the anode side, a GDC-AFL with a thickness of about 140 nm, deposited via radio-frequency sputtering, was inserted into the anode-electrolyte interface. SOFCs with and without a GDC-AFL were electrochemically characterized. In an intermediate temperature range of about 700 - 800 degrees C, the application of the GDC-AFL led to an increase in the peak power density of approximately 16%.

  7. Continuum models of focused electron beam induced processing

    PubMed Central

    Lobo, Charlene; Friedli, Vinzenz; Szkudlarek, Aleksandra; Utke, Ivo

    2015-01-01

    Summary Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models. PMID:26425405

  8. Electron beam modeling on LTX

    NASA Astrophysics Data System (ADS)

    Szalkowski, Gregory; Majeski, Richard; Schmitt, John

    2014-10-01

    The lithium tokamak experiment (LTX) is a low aspect ratio tokamak with a steel clad copper shell that can be heated to 300-400 °C and coated with lithium. The lithium coating has been shown to decrease impurities in the plasma and decrease the recycling coefficient, improving plasma performance. The coating is applied to the walls by heating the shells, then using an electron beam to evaporate a pool of lithium located at the bottom of the shell. The beam is steered using the magnetic field generated by the field coils. This method allows for rapid evaporation of the lithium, producing a 50-100 nm coating in approximately 5 minutes. The current electron beam system can only coat half of the shell surface. A new electron beam system has been installed on LTX to coat the remaining shell surface. A model of this electron gun has been created using the AMaze program series (Field Precision LCC). The model will be used to find the magnetic fields needed to steer the electron beam produced by the gun to the lithium pool. The model will also show the electropotential produced both at the electron gun head and in the vessel. The model may also be used to find the dispersion of the beam and therefore the effective power density of the beam as it impacts the lithium pool. Supported by US DOE Contracts DE-AC02-09CH11466 and DE-AC52-07NA27344 and in part by the U.S. Department of Energy, Office of Science, Office of Workforce Development for Teachers and Scientists (WDTS) under the Science Undergraduate Laboratory Internship.

  9. Practical Teaching about Electron Beams

    ERIC Educational Resources Information Center

    Strawson, R. J.

    2009-01-01

    If you have seen tubes like the ones we describe here in the back of a cupboard but have been reluctant to use them, now is the time to get them out. The aim of this article is to record the history of teaching about electron beams, particularly with Teltron equipment, and in doing so encourage those schools that are equipped with these tubes to…

  10. APPARATUS FOR ELECTRON BEAM HEATING CONTROL

    DOEpatents

    Jones, W.H.; Reece, J.B.

    1962-09-18

    An improved electron beam welding or melting apparatus is designed which utilizes a high voltage rectifier operating below its temperature saturation region to decrease variations in electron beam current which normally result from the gas generated in such apparatus. (AEC)

  11. Comparative Electrical Study on n-Type Cd1-XSeX and CdSe Thin Films Deposited by Electron Beam Evaporation Technique

    NASA Astrophysics Data System (ADS)

    Verma, Aneet Kumar; Tripathi, Ravishankar Nath; Vishwakarma, Rahul S. R.

    2011-10-01

    Since the last two decades, in the area of electronics, group II-VI compounds have drawn considerable interest due to their various applications. Cadmium selenide (CdSe), a member of this group, is one of the promising semiconducting material from its application point of view. The n-type Cd1-XSeX and CdSe films have been deposited onto ultra cleaned glass substrates by electron bean evaporated technique under 10-5 torr vacuum. The n-type Cd1-XSeX thin films has confirmed by Hall effect data. The resistivity of the film has been determined by I-V measurement using four probe setup. It is observed that the resistivity decreases with increases Cd/Se ratio and we found that n-type Cd1-XSeX thin films is more better than CdSe thin films.

  12. Light modulated electron beam driven radiofrequency emitter

    DOEpatents

    Wilson, M.T.; Tallerico, P.J.

    1979-10-10

    The disclosure relates to a light modulated electron beam-driven radiofrequency emitter. Pulses of light impinge on a photoemissive device which generates an electron beam having the pulse characteristics of the light. The electron beam is accelerated through a radiofrequency resonator which produces radiofrequency emission in accordance with the electron, hence, the light pulses.

  13. Plasma and ion barrier for electron beam spot stability

    SciTech Connect

    Kwan, T.J.T.; Snell, C.M.

    1999-04-01

    The concept of a self-biased target to spatially confine the ions generated by the bombardment of intense electron beams on bremsstrahlung conversion targets has been predicted by computer simulation and further verified by experiments at the Integrated Test Stand for DARHT at Los Alamos National Laboratory. This technical article reports an alternative method of containing the plasmas and ions from the bremsstrahlung conversion target if the energy density of the electron beam is below a certain threshold. With the proposed changes of the electron beam parameters of the second axis of DARHT, the authors are able to show that a thin (0.5 mm) metallic barrier such as pure beryllium, or boron carbide with desirable thermal properties, is sufficiently transparent to the 20 MeV DARHT beam and at the same time able to confine the ions between the target and the barrier foil. The temperature rise in the foil due to energy deposited by the electron beam is expected to be below the melting point of the materials for the first three pulses. More important, they have shown in their time dependent particle-in-cell simulations that the deployment of a barrier situated 1 to 2 cm away from the converter target can achieve the ion confinement needed for the stability of the electron beam spot.

  14. Reinforcing multiwall carbon nanotubes by electron beam irradiation

    SciTech Connect

    Duchamp, Martial; Meunier, Richard; Smajda, Rita; Mionic, Marijana; Forro, Laszlo; Magrez, Arnaud; Seo, Jin Won; Song, Bo; Tomanek, David

    2010-10-15

    We study the effect of electron beam irradiation on the bending modulus of multiwall carbon nanotubes grown by chemical vapor deposition. Atomic force microscopy observations of the nanotube deflection in the suspended-beam geometry suggest an internal, reversible stick-slip motion prior to irradiation, indicating presence of extended defects. Upon electron beam irradiation, nanotubes with an initial bending modulus exceeding 10 GPa initially get stiffer, before softening at high doses. Highly defective nanotubes with smaller initial bending moduli do not exhibit the initial reinforcement. These data are explained by ab initio molecular dynamics calculations suggesting a spontaneous cross-linking of neighboring nanotube walls at extended vacancy defects created by the electron beam, in agreement with electron microscopy observations. At low defect concentration, depending on the edge morphology, the covalent bonds between neighboring nanotube walls cause reinforcement by resisting relative motion of neighboring walls. At high concentration of defects that are present initially or induced by high electron beam dose, the structural integrity of the entire system suffers from increasing electron beam damage.

  15. Copper-ceria interaction: A combined photoemission and DFT study

    NASA Astrophysics Data System (ADS)

    Szabová, Lucie; Skála, Tomáš; Matolínová, Iva; Fabris, Stefano; Farnesi Camellone, Matteo; Matolín, Vladimír

    2013-02-01

    Stoichiometric and partially reduced ceria films were deposited on preoxidized Ru(0 0 0 1) crystal by Ce evaporation in oxygen atmosphere of different pressures at 700 K. Copper-ceria interaction was investigated by deposition of metalic copper on both types of substrate. The samples were characterized by low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) of core states and resonant photoelectron spectroscopy (RPES) of the valence bands. Copper adsorption on stoichiometric ceria caused reduction of CeO2, while on the oxygen-defficient ceria it partially reoxidized the substrate. This is in agreement with DFT+U calculations of copper adsorption on stoichiometric and defective ceria surfaces.

  16. Synthesis and characterization of titanium carbide, titanium boron carbonitride, titanium boride/titanium carbide and titanium carbide/chromium carbide multilayer coatings by reactive and ion beam assisted, electron beam-physical vapor deposition (EB-PVD)

    NASA Astrophysics Data System (ADS)

    Wolfe, Douglas Edward

    The purpose of the present work was to investigate the synthesis of titanium carbide, TiBCN, TiB2/TiC and TiC/Cr23C6 multilayer coatings by several methods of electron beam-physical vapor deposition (EB-PVD) and examine the affects of various processing parameters on the properties and microstructures of the coatings. TiC was successfully deposited by reactive ion beam assisted (RIBA), EB-PVD and the results were compared to various titanium carbide coatings deposited by a variety of techniques. The affects of substrate temperature and ion beam current density were correlated with composition, hardness, changes in the lattice parameter, degree of crystallographic texture, residual stress, surface morphology, and microstructure. The average Vicker's hardness number was found to increase with increasing ion beam current density and increase over the substrate temperature range of 250°C to 650°C. The average Vicker's hardness number decreased at a substrate temperature of 750°C as a result of texturing and microstructure. The present investigation shows that the average Vicker's hardness number is not only a function of the composition, but also the microstructure including the degree of crystallographic texture. TiB2/TiC multilayer coatings were deposited by argon ion beam assisted, EB-PVD with varying number of total layers to two different film thicknesses under slightly different deposition conditions. In both cases, the hardness of the coatings increased with increasing number of total layers. The adhesion of the coatings ranged from 30 N to 50 N, with the better adhesion values obtained with the thinner coatings. The crystallographic texture coefficients of both the TiC and TiB2 layers were found to change with increasing number of total layers. The multilayer design was found to significantly affect the microstructure and grain size of the deposited coatings. The fracture toughness was found to decrease with increasing number of total layers and was

  17. Electron beam controller. [using magnetic field to refocus spent electron beam in microwave oscillator tube

    NASA Technical Reports Server (NTRS)

    Kosmahl, H. G. (Inventor)

    1973-01-01

    An electron beam device which extracts energy from an electron beam before the electrons of the beam are captured by a collector apparatus is described. The device produces refocusing of a spent electron beam by minimizing tranverse electron velocities in the beam where the electrons, having a multiplicity of axial velocities, are sorted at high efficiency by collector electrodes.

  18. Electron beam effects in a UV FEL

    SciTech Connect

    Wong, R.K.; Blau, J.; Colson, W.B.

    1995-12-31

    At the Continuous Electron Beam Accelerator Facility (CEBAF), a free electron laser (FEL) is designed to produce ultraviolet (UV) light. A four-dimensional FEL simulation studies the effects of betatron oscillations, external focusing, and longitudinal pulse compression of the electron beam on the FEL performance.

  19. Electron beam selectively seals porous metal filters

    NASA Technical Reports Server (NTRS)

    Snyder, J. A.; Tulisiak, G.

    1968-01-01

    Electron beam welding selectively seals the outer surfaces of porous metal filters and impedances used in fluid flow systems. The outer surface can be sealed by melting a thin outer layer of the porous material with an electron beam so that the melted material fills all surface pores.

  20. Dual-Cathode Electron-Beam Source

    NASA Technical Reports Server (NTRS)

    Bradley, James G.; Conley, Joseph M.; Wittry, David B.

    1988-01-01

    Beam from either cathode electromagnetically aligned with exit port. Electron beam from either of two cathodes deflected by magnetic and electric fields to central axis. Mechanical alignment of beam easy because cathode axes, anode apertures, and electron trajectories coplanar. Applications where uninterrupted service needed: scanning electron microscopes, transmission electron microscopes, electron-beam lithography equipment, Auger instruments, and microfocused x-ray sources.

  1. Electron-Beam Recombination Lasers

    NASA Astrophysics Data System (ADS)

    Rhoades, Robert Lewis

    1992-01-01

    The first known instance of electron-beam pumping of the 546.1 nm mercury laser is reported. This has been achieved using high-energy electrons to create intense ionization in a coaxial diode chamber containing a mixture of noble gases with a small amount of mercury vapor. Also reported are the results of a study of the 585.3 nm neon laser in He:Ne:Ar mixtures under similar experimental conditions. Both of these lasers are believed to be predominantly pumped by recombination. For the mercury laser, kinetic processes in the partially ionized plasma following the excitation pulse of high-energy electrons should favor the production of atomic mercury ions and molecular ions containing mercury. Subsequent recombination with electrons heavily favors the production of the 7^3S and 6^3 D states of Hg, of which 7^3S is the upper level of the reported laser. For the neon laser, the dominant recombining ion has been previously shown to be Ne_2^{+}. One of the dominant roles of helium in recombination lasers is inferred from the data for the neon laser at low helium concentrations. Helium appears to be necessary for the rapid relaxation of the electron energy which then increases the reaction rates for all known recombination processes thus increasing the pump rate into the upper state.

  2. A study of electron beam-induced conductivity in resists.

    PubMed

    Hwu, J J; Joy, D C

    1999-01-01

    The charging of polymeric resist materials during electron beam irradiation leads to significant problems during imaging and lithography processes. Charging occurs because of charge deposition in the polymer and charge generation/trapping due to formation of electron-hole pairs in the dielectric. The presence of such charge also results in the phenomena of electron beam-induced conductivity (EBIC). Electron beam-induced conductivity data have been obtained for three commercial e-beam resists under a variety of dose rate and temperature conditions. From the observed values of induced conductivity under varying conditions significant information about the generation of electron-hole pair and the transport of charge in the resist can be obtained. Three electron beam resists, EBR900, ZEP7000, and PBS are examined by an external bias method. The difference in resist chemistry is considered to play the role in the initial state EBIC behaviors among three resists even though the way that it affects the behaviors is not clear. A comparison of the power consumption comparison is proposed as a measure to give a preliminary estimate of the carrier concentration and carrier drift velocity differences among the resists. A simple single trap model with constant activation energy is proposed and provides good agreement with experiment.

  3. Beam rotation and shear in a large electron beam diode

    SciTech Connect

    Mansfield, C.R.; Oona, H.; Shurter, R.P.

    1990-01-01

    The time averaged electron beam current distribution of one of the electron guns of the Large Aperture Module (LAM) of the Aurora laser was measured as part of a larger set of experiments designed to study the electron beam transport to and energy deposition in the LAM laser chamber. The LAM laser chamber has a 1-m {times} 1-m aperture and is pumped from two sides along a 2-m length. A 10 ga. stainless steel sheet was placed inside the laser chamber and served multiple purposes. First, it was used to convert high energy electrons into X-rays in order to make radiograms of the electron beam. Second, the sheet was used as a Faraday cup to measure the total beam current. Third, individual Faraday cups were mounted on the plate to sample the time history of the electron beam at various positions. Each of the LAM electron gun diodes produces a beam of 750 kV electrons with a total current of about 500 kA which is relatively uniform over the cathode area of 1 m {times} 2 m. An applied magnetic field of about 1300 Gauss is used to prevent pinch of the beam during beam transport.

  4. Electron beam curing of polymer matrix composites

    SciTech Connect

    Janke, C.J.; Wheeler, D.; Saunders, C.

    1998-01-08

    The purpose of the CRADA was to conduct research and development activities to better understand and utilize the electron beam PMC curing technology. This technology will be used to replace or supplement existing PMC thermal curing processes in Department of Energy (DOE) Defense Programs (DP) projects and American aircraft and aerospace industries. This effort involved Lockheed Martin Energy Systems, Inc./Lockheed Martin Energy Research Corp. (Contractor), Sandia National Laboratories, and ten industrial Participants including four major aircraft and aerospace companies, three advanced materials companies, and three electron beam processing organizations. The technical objective of the CRADA was to synthesize and/or modify high performance, electron beam curable materials that meet specific end-use application requirements. There were six tasks in this CRADA including: Electron beam materials development; Electron beam database development; Economic analysis; Low-cost Electron Beam tooling development; Electron beam curing systems integration; and Demonstration articles/prototype structures development. The contractor managed, participated and integrated all the tasks, and optimized the project efforts through the coordination, exchange, and dissemination of information to the project participants. Members of the Contractor team were also the principal inventors on several electron beam related patents and a 1997 R and D 100 Award winner on Electron-Beam-Curable Cationic Epoxy Resins. The CRADA achieved a major breakthrough for the composites industry by having successfully developed high-performance electron beam curable cationic epoxy resins for use in composites, adhesives, tooling compounds, potting compounds, syntactic foams, etc. UCB Chemicals, the world`s largest supplier of radiation-curable polymers, has acquired a license to produce and sell these resins worldwide.

  5. Nanowire growth by an electron beam induced massive phase transformation

    DOE PAGESBeta

    Sood, Shantanu; Kisslinger, Kim; Gouma, Perena

    2014-11-15

    Tungsten trioxide nanowires of a high aspect ratio have been synthesized in-situ in a TEM under an electron beam of current density 14A/cm² due to a massive polymorphic reaction. Sol-gel processed pseudocubic phase nanocrystals of tungsten trioxide were seen to rapidly transform to one dimensional monoclinic phase configurations, and this reaction was independent of the substrate on which the material was deposited. The mechanism of the self-catalyzed polymorphic transition and accompanying radical shape change is a typical characteristic of metastable to stable phase transformations in nanostructured polymorphic metal oxides. A heuristic model is used to confirm the metastable to stablemore » growth mechanism. The findings are important to the control electron beam deposition of nanowires for functional applications starting from colloidal precursors.« less

  6. Nanowire growth by an electron beam induced massive phase transformation

    SciTech Connect

    Sood, Shantanu; Kisslinger, Kim; Gouma, Perena

    2014-11-15

    Tungsten trioxide nanowires of a high aspect ratio have been synthesized in-situ in a TEM under an electron beam of current density 14A/cm² due to a massive polymorphic reaction. Sol-gel processed pseudocubic phase nanocrystals of tungsten trioxide were seen to rapidly transform to one dimensional monoclinic phase configurations, and this reaction was independent of the substrate on which the material was deposited. The mechanism of the self-catalyzed polymorphic transition and accompanying radical shape change is a typical characteristic of metastable to stable phase transformations in nanostructured polymorphic metal oxides. A heuristic model is used to confirm the metastable to stable growth mechanism. The findings are important to the control electron beam deposition of nanowires for functional applications starting from colloidal precursors.

  7. Low Emittance Electron Beam Studies

    SciTech Connect

    Tikhoplav, Rodion

    2006-01-01

    We have studied the properties of a low emittance electron beam produced by laser pulses incident onto an rf gun photocathode. The experiments were carried out at the A0 photoinjector at Fermilab. Such beam studies are necessary for fixing the design of new Linear Colliders as well as for the development of Free Electron Lasers. An overview of the A0 photoinjector is given in Chapter 1. In Chapter 2 we describe the A0 photoinjector laser system. A stable laser system is imperative for reliable photoinjector operation. After the recent upgrade, we have been able to reach a new level of stability in the pulse-to-pulse fluctuations of the pulse amplitude, and of the temporal and transverse profiles. In Chapter 3 we present a study of transverse emittance versus the shape of the photo-cathode drive-laser pulse. For that purpose a special temporal profile laser shaping device called a pulse-stacker was developed. In Chapter 4 we discuss longitudinal beam dynamics studies using a two macro-particle bunch; this technique is helpful in analyzing pulse compression in the magnetic chicane, as well as velocity bunching effects in the rf-gun and the 9-cell accelerating cavity. In Chapter 5 we introduce a proposal for laser acceleration of electrons. We have developed a laser functioning on the TEM*01 mode, a mode with a longitudinal electric field component which is suitable for such a process. Using this technique at energies above 40 MeV, one would be able to observe laser-based acceleration.

  8. The Electron Beam Ion Source (EBIS)

    ScienceCinema

    Brookhaven Lab

    2016-07-12

    Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

  9. The Electron Beam Ion Source (EBIS)

    SciTech Connect

    Brookhaven Lab

    2009-06-09

    Brookhaven National Lab has successfully developed a new pre-injector system, called the Electron Beam Ion Source, for the Relativistic Heavy Ion Collider (RHIC) and NASA Space Radiation Laboratory science programs. The first of several planned improvemen

  10. Redesigned Electron-Beam Furnace Boosts Productivity

    NASA Technical Reports Server (NTRS)

    Williams, Gary A.

    1995-01-01

    Redesigned electron-beam furnace features carousel of greater capacity so more experiments conducted per loading, and time spent on reloading and vacuum pump-down reduced. Common mounting plate for electron source and carousel simplifies installation and reduces vibration.

  11. Technical Seminar: Electron Beam Forming Fabrication

    NASA Video Gallery

    EBF³ uses a focused electron beam in a vacuum environment to create a molten pool on a metallic substrate. This layer-additive process enables fabrication of parts directly from CAD drawings. The ...

  12. High speed focused ion and electron beam nanofabrication

    NASA Astrophysics Data System (ADS)

    Melngailis, John

    2009-03-01

    Both focused ion beams and electron beams can be used for direct, maskless, resistless nanofabrication as well as for lithography. So far the direct fabrication has been limited to applications such as photomask repair, circuit restructuring, failure analysis, and the creation of various highly specialized structures. Recent developments in maskless fabrication, so far aimed mainly at to resist exposure, suggest that this picture might change. For example, IMS in Vienna, Austria is developing an instrument that can be characterized as an ion beam or electron beam dot matrix printer. The total current on the sample available from this kind of instrument is at least three orders of magnitude larger than from a single beam instrument. This may lead to new applications of charged particle beam fabrication, as well as enable applications considered in the past but rejected because of very low throughput. An example of one such application is the direct writing of the identity in RFID tags using ion beam implantation. Recently we have also shown that electron beams can be used to deposit relatively pure platinum from an inorganic precursor gas, Pt(PF3)4. Such metal deposits can be used as contacts to carbon nanotubes, semiconductor nano wires, organic fibers, or other structures where conventional lithography is impractical.

  13. Influence of Electron Beam Pulses on Hα Line Formation

    NASA Astrophysics Data System (ADS)

    Varady, M.; Kašparova, J.; Karlický, M.; Heinzel, P.; Moravec, Z.

    In this contribution we present results of our simulations focused on determination of spectroscopic signs of the presence of non--thermal electrons in the formation region of Hα using three mutually communicating codes. The originally autonomous and highly specialised codes model three simultaneously acting processes in flares: the precipitation and energy dissipation of the non-thermal power--law electron beams in the solar atmosphere, the hydrodynamic response of the atmosphere to the energy deposited by the beams, and the radiative transfer in chromosphere and photosphere which determines the hydrogen line profiles and their time evolution. The results show possible existence of a new diagnostic method on presence of electron beams in the formation region of the Hα line.

  14. Stabilization of electron beam spot size by self bias potential

    SciTech Connect

    Kwan, T.J.T.; Moir, D.C.; Snell, C.M.; Kang, M.

    1998-12-31

    In high resolution flash x-ray imaging technology the electric field developed between the electron beam and the converter target is large enough to draw ions from the target surface. The ions provide fractional neutralization and cause the electron beam to focus radially inward, and the focal point subsequently moves upstream due to the expansion of the ion column. A self-bias target concept is proposed and verified via computer simulation that the electron charge deposited on the target can generate an electric potential, which can effectively limit the ion motion and thereby stabilize the growth of the spot size. A target chamber using the self bias target concept was designed and tested in the Integrated Test Stand (ITS). The authors have obtained good agreement between computer simulation and experiment.

  15. Plasma lenses for focusing relativistic electron beams

    SciTech Connect

    Govil, R.; Wheeler, S.; Leemans, W.

    1997-04-01

    The next generation of colliders require tightly focused beams with high luminosity. To focus charged particle beams for such applications, a plasma focusing scheme has been proposed. Plasma lenses can be overdense (plasma density, n{sub p} much greater than electron beam density, n{sub b}) or underdense (n{sub p} less than 2 n{sub b}). In overdense lenses the space-charge force of the electron beam is canceled by the plasma and the remaining magnetic force causes the electron beam to self-pinch. The focusing gradient is nonlinear, resulting in spherical aberrations. In underdense lenses, the self-forces of the electron beam cancel, allowing the plasma ions to focus the beam. Although for a given beam density, a uniform underdense lens produces smaller focusing gradients than an overdense lens, it produces better beam quality since the focusing is done by plasma ions. The underdense lens can be improved by tapering the density of the plasma for optimal focusing. The underdense lens performance can be enhanced further by producing adiabatic plasma lenses to avoid the Oide limit on spot size due to synchrotron radiation by the electron beam. The plasma lens experiment at the Beam Test Facility (BTF) is designed to study the properties of plasma lenses in both overdense and underdense regimes. In particular, important issues such as electron beam matching, time response of the lens, lens aberrations and shot-to-shot reproducibility are being investigated.

  16. Portable Electron-Beam Free-Form Fabrication System

    NASA Technical Reports Server (NTRS)

    Watson, J. Kevin; Petersen, Daniel D.; Taminger, Karen M.; Hafley, Robert A.

    2005-01-01

    when not under vacuum. During operation, wire will be fed to a fixed location, entering the melted pool created by the electron beam. Heated by the electron beam, the wire will melt and fuse to either the substrate or with the previously deposited metal wire fused on top of the positioning table. Based on a computer aided design (CAD) model and controlled by a computer, the positioning subsystem

  17. Carbon deposition behaviour in metal-infiltrated gadolinia doped ceria electrodes for simulated biogas upgrading in solid oxide electrolysis cells

    NASA Astrophysics Data System (ADS)

    Duboviks, V.; Lomberg, M.; Maher, R. C.; Cohen, L. F.; Brandon, N. P.; Offer, G. J.

    2015-10-01

    One of the attractive applications for reversible Solid Oxide Cells (SOCs) is to convert CO2 into CO via high temperature electrolysis, which is particularly important for biogas upgrading. To improve biogas utility, the CO2 component can be converted into fuel via electrolysis. A significant issue for SOC operation on biogas is carbon-induced catalyst deactivation. Nickel is widely used in SOC electrodes for reasons of cost and performance, but it has a low tolerance to carbon deposition. Two different modes of carbon formation on Ni-based electrodes are proposed in the present work based on ex-situ Raman measurements which are in agreement with previous studies. While copper is known to be resistant towards carbon formation, two significant issues have prevented its application in SOC electrodes - namely its relatively low melting temperature, inhibiting high temperature sintering, and low catalytic activity for hydrogen oxidation. In this study, the electrodes were prepared through a low temperature metal infiltration technique. Since the metal infiltration technique avoids high sintering temperatures, Cu-Ce0.9Gd0.1O2-δ (Cu-CGO) electrodes were fabricated and tested as an alternative to Ni-CGO electrodes. We demonstrate that the performance of Cu-CGO electrodes is equivalent to Ni-CGO electrodes, whilst carbon formation is fully suppressed when operated on biogas mixture.

  18. Device and method for electron beam heating of a high density plasma

    DOEpatents

    Thode, Lester E.

    1981-01-01

    A device and method for relativistic electron beam heating of a high density plasma in a small localized region. A relativistic electron beam generator produces a high voltage electron beam which propagates along a vacuum drift tube and is modulated to initiate electron bunching within the beam. The beam is then directed through a low density gas chamber which provides isolation between the vacuum modulator and the relativistic electron beam target. The relativistic beam is then applied to a high density target plasma which typically comprises DT, DD, hydrogen boron or similar thermonuclear gas at a density of 10.sup.17 to 10.sup.20 electrons per cubic centimeter. The target plasma is ionized prior to application of the electron beam by means of a laser or other preionization source. Utilizing a relativistic electron beam with an individual particle energy exceeding 3 MeV, classical scattering by relativistic electrons passing through isolation foils is negligible. As a result, relativistic streaming instabilities are initiated within the high density target plasma causing the relativistic electron beam to efficiently deposit its energy into a small localized region within the high density plasma target.

  19. Patient radiation doses for electron beam CT.

    PubMed

    Castellano, Isabel A; Dance, David R; Skinner, Claire L; Evans, Phil M

    2005-08-01

    A Monte Carlo based computer model has been developed for electron beam computed tomography (EBCT) to calculate organ and effective doses in a humanoid hermaphrodite phantom. The program has been validated by comparison with experimental measurements of the CT dose index in standard head and body CT dose phantoms; agreement to better than 8% has been found. The robustness of the model has been established by varying the input parameters. The amount of energy deposited at the 12:00 position of the standard body CT dose phantom is most susceptible to rotation angle, whereas that in the central region is strongly influenced by the beam quality. The program has been used to investigate the changes in organ absorbed doses arising from partial and full rotation about supine and prone subjects. Superficial organs experience the largest changes in absorbed dose with a change in subject orientation and for partial rotation. Effective doses for typical clinical scan protocols have been calculated and compared with values obtained using existing dosimetry techniques based on full rotation. Calculations which make use of Monte Carlo conversion factors for the scanner that best matches the EBCT dosimetric characteristics consistently overestimate the effective dose in supine subjects by typically 20%, and underestimate the effective dose in prone subjects by typically 13%. These factors can therefore be used to correct values obtained in this way. Empirical dosimetric techniques based on the dose-length product yield errors as great as 77%. This is due to the sensitivity of the dose length product to individual scan lengths. The magnitude of these errors is reduced if empirical dosimetric techniques based on the average absorbed dose in the irradiated volume (CTDIvol) are used. Therefore conversion factors specific to EBCT have been calculated to convert the CTDIvol to an effective dose. PMID:16193782

  20. Patient radiation doses for electron beam CT

    SciTech Connect

    Castellano, Isabel A.; Dance, David R.; Skinner, Claire L.; Evans, Phil M.

    2005-08-15

    A Monte Carlo based computer model has been developed for electron beam computed tomography (EBCT) to calculate organ and effective doses in a humanoid hermaphrodite phantom. The program has been validated by comparison with experimental measurements of the CT dose index in standard head and body CT dose phantoms; agreement to better than 8% has been found. The robustness of the model has been established by varying the input parameters. The amount of energy deposited at the 12:00 position of the standard body CT dose phantom is most susceptible to rotation angle, whereas that in the central region is strongly influenced by the beam quality. The program has been used to investigate the changes in organ absorbed doses arising from partial and full rotation about supine and prone subjects. Superficial organs experience the largest changes in absorbed dose with a change in subject orientation and for partial rotation. Effective doses for typical clinical scan protocols have been calculated and compared with values obtained using existing dosimetry techniques based on full rotation. Calculations which make use of Monte Carlo conversion factors for the scanner that best matches the EBCT dosimetric characteristics consistently overestimate the effective dose in supine subjects by typically 20%, and underestimate the effective dose in prone subjects by typically 13%. These factors can therefore be used to correct values obtained in this way. Empirical dosimetric techniques based on the dose-length product yield errors as great as 77%. This is due to the sensitivity of the dose length product to individual scan lengths. The magnitude of these errors is reduced if empirical dosimetric techniques based on the average absorbed dose in the irradiated volume (CTDI{sub vol}) are used. Therefore conversion factors specific to EBCT have been calculated to convert the CTDI{sub vol} to an effective dose.

  1. Artificial auroras in the upper atmosphere. 1. Electron beam injections

    SciTech Connect

    Burch, J.L.; Gibson, W.C.; Marshall, J.A. ); Mende, S.B.; Swenson, G.R. ); Kawashima, N. ); Roberts, W.T. ); Taylor, W.W.L. ); Neubert, T. )

    1993-03-19

    Artificial electron beams from the Space Experiments with Particle Accelerators (SEPAC) on the ATLAS 1 Spacelab payload were used to stimulate auroral emissions at southern auroral latitudes. The emitted electron beams were monoenergetic at 6.25 keV and were fired in one-second pulses every fifteen seconds with currents of 1.21 A. Optical measurements of the beam were made in the vicinity of the Shuttle Orbiter by its on-board television camera and in the upper atmosphere by the Atmospheric Emissions Photometric Imager (AEPI). AEPI imaged auroral emissions in both white light and at the 427.8 nm N[sub 2][sup +] emission line. Energy deposition calculations and the results of previous sounding-rocket experiments had suggested that emissions with scale sizes of about 130 meters would result from the artificial electron beams with the visible emissions extending from about 110 to 130 km altitudes. In the ATLAS 1 experiments the auroral imaging was performed from the Shuttle, providing a new perspective on the artificial auroras and allowing the emissions to be traced from altitudes near the 295 km Shuttle altitude down to the 110 km level along the curved magnetic field lines. 11 refs., 3 figs., 1 tab.

  2. Collimation Studies with Hollow Electron Beams

    SciTech Connect

    Stancari, G.; Annala, G.; Johnson, T.R.; Saewert, G.W.; Shiltsev, V.; Still, D.A.; Valishev, A.; /Fermilab

    2011-08-01

    Recent experimental studies at the Fermilab Tevatron collider have shown that magnetically confined hollow electron beams can act as a new kind of collimator for high-intensity beams in storage rings. In a hollow electron beam collimator, electrons enclose the circulating beam. Their electric charge kicks halo particles transversely. If their distribution is axially symmetric, the beam core is unaffected. This device is complementary to conventional two-stage collimation systems: the electron beam can be placed arbitrarily close to the circulating beam; and particle removal is smooth, so that the device is a diffusion enhancer rather than a hard aperture limitation. The concept was tested in the Tevatron collider using a hollow electron gun installed in one of the existing electron lenses. We describe some of the technical aspects of hollow-beam scraping and the results of recent measurements.

  3. Evidence of locally enhanced target heating due to instabilities of counter-streaming fast electron beams

    SciTech Connect

    Koester, Petra; Cecchetti, Carlo A.; Booth, Nicola; Woolsey, Nigel; Chen, Hui; Evans, Roger G.; Gregori, Gianluca; Li, Bin; Mithen, James; Murphy, Christopher D.; Labate, Luca; Gizzi, Leonida A.; Levato, Tadzio; Makita, Mikako; Riley, David; Notley, Margaret; Pattathil, Rajeev

    2015-02-15

    The high-current fast electron beams generated in high-intensity laser-solid interactions require the onset of a balancing return current in order to propagate in the target material. Such a system of counter-streaming electron currents is unstable to a variety of instabilities such as the current-filamentation instability and the two-stream instability. An experimental study aimed at investigating the role of instabilities in a system of symmetrical counter-propagating fast electron beams is presented here for the first time. The fast electron beams are generated by double-sided laser-irradiation of a layered target foil at laser intensities above 10{sup 19 }W/cm{sup 2}. High-resolution X-ray spectroscopy of the emission from the central Ti layer shows that locally enhanced energy deposition is indeed achieved in the case of counter-propagating fast electron beams.

  4. Electron Beam Technology - Some Recent Developments

    NASA Astrophysics Data System (ADS)

    Iqbal, Munawar; Fazal-E-Aleem

    2011-06-01

    Electron beam technology has been in focus since long due to wide variety of applications in research and industry. One of the important modes of e-beam production is through thermionic emission. Improvements and advancement in enhancing the capabilities of electron beam sources compatible with the task to be accomplished at a reduced cost are therefore necessary. We give an update of the recently developed and reported e-guns which are easy to fabricate, assemble and more efficient. Besides being cost effective, these guns are user friendly.

  5. Control and Manipulation of Electron Beams

    SciTech Connect

    Piot, Philippe

    2009-01-22

    The concepts of the advanced accelerators and light source rely on the production of bright electron beams. The rms areas of the beam phase space often need to be tailored to the specific applications. Furthermore, a new class of the forefront research calls for detailed specific distribution such as the particle density in the time coordinate. Several groups are tackling these various challenges and in this report we attempt to give a review of the state-of-the-art of the control and manipulation of the electron beams.

  6. Electron beam treatment of stack gases

    NASA Astrophysics Data System (ADS)

    Frank, N.; Kawamura, K.; Miller, G.

    A method of simultaneously removing sulfur dioxide and nitrogen oxides from high sulfur, coal-fired utility boiler combustion gases is discussed. Process development history is briefly presented and salient details of a commercial demonstration unit currently under construction at an electric utility power plant in Indiana are given. Detailed discussion on the design details and performance requirements of a cable connected set of 80 kW electron beam sources precedes a discussion of the projected economics of the process. Requirements for future electron beam machine configurations and capacities as well as impact on the radiation machine manufacturing industry, assuming acceptance of the process by the electric utilities, are presented.

  7. A conceptual design for an electron beam

    SciTech Connect

    Garcia, M

    1999-02-15

    This report is a brief description of a model electron beam, which is meant to serve as a pulsed heat source that vaporizes a metal fleck into an ''under-dense'' cloud. See Reference 1. The envelope of the electron beam is calculated from the paraxial ray equation, as stated in Reference 2. The examples shown here are for 5 A, 200 keV beams that focus to waists of under 0.4 mm diameter, within a cylindrical volume of 10 cm radius and length. The magnetic fields assumed in the examples are moderate, 0.11 T and 0.35 T, and can probably be created by permanent magnets.

  8. Cryogenic electron beam induced chemical etching.

    PubMed

    Martin, Aiden A; Toth, Milos

    2014-11-12

    Cryogenic cooling is used to enable efficient, gas-mediated electron beam induced etching (EBIE) in cases where the etch rate is negligible at room and elevated substrate temperatures. The process is demonstrated using nitrogen trifluoride (NF3) as the etch precursor, and Si, SiO2, SiC, and Si3N4 as the materials volatilized by an electron beam. Cryogenic cooling broadens the range of precursors that can be used for EBIE, and enables high-resolution, deterministic etching of materials that are volatilized spontaneously by conventional etch precursors as demonstrated here by NF3 and XeF2 EBIE of silicon. PMID:25333843

  9. Control of Space-Based Electron Beam Free Form Fabrication

    NASA Technical Reports Server (NTRS)

    Seifzer. W. J.; Taminger, K. M.

    2007-01-01

    Engineering a closed-loop control system for an electron beam welder for space-based additive manufacturing is challenging. For earth and space based applications, components must work in a vacuum and optical components become occluded with metal vapor deposition. For extraterrestrial applications added components increase launch weight, increase complexity, and increase space flight certification efforts. Here we present a software tool that closely couples path planning and E-beam parameter controls into the build process to increase flexibility. In an environment where data collection hinders real-time control, another approach is considered that will still yield a high quality build.

  10. Silicon nanowires prepared by electron beam evaporation in ultrahigh vacuum

    PubMed Central

    2012-01-01

    One-dimensional silicon nanowires (SiNWs) were prepared by electron beam evaporation in ultrahigh vacuum (UHV). The SiNWs can be grown through either vapor–liquid-solid (VLS) or oxide-assisted growth (OAG) mechanism. In VLS growth, SiNWs can be formed on Si surface, not on SiO2 surfaces. Moreover, low deposition rate is helpful for producing lateral SiNWs by VLS. But in OAG process, SiNWs can be grown on SiO2 surfaces, not on Si surfaces. This work reveals the methods of producing large-scale SiNWs in UHV. PMID:22559207

  11. A simple model of electron beam initiated dielectric breakdown

    NASA Technical Reports Server (NTRS)

    Beers, B. L.; Daniell, R. E.; Delmer, T. N.

    1985-01-01

    A steady state model that describes the internal charge distribution of a planar dielectric sample exposed to a uniform electron beam was developed. The model includes the effects of charge deposition and ionization of the beam, separate trap-modulated mobilities for electrons and holes, electron-hole recombination, and pair production by drifting thermal electrons. If the incident beam current is greater than a certain critical value (which depends on sample thickness as well as other sample properties), the steady state solution is non-physical.

  12. Emission of an intense electron beam from a ceramic honeycomb

    NASA Astrophysics Data System (ADS)

    Friedman, M.; Myers, M.; Hegeler, F.; Swanekamp, S. B.; Sethian, J. D.; Ludeking, L.

    2003-01-01

    Inserting a slab of honeycomb ceramic in front of the emitting surface of a large-area cathode improves the electron beam emission uniformity, decreases the beam current rise and fall times, and maintains a more constant diode impedance. Moreover, changing the cathode material from velvet to carbon fiber achieved a more robust cathode that starts to emit at a higher electric field without a degradation in beam uniformity. In addition, an 80% reduction in the postshot diode pressure was also observed when gamma alumina was deposited on the ceramic. A possible explanation is that reabsorption and recycling of adsorbed gases takes place.

  13. Industrial perspective on focused electron beam-induced processes

    NASA Astrophysics Data System (ADS)

    Bret, Tristan; Hofmann, Thorsten; Edinger, Klaus

    2014-12-01

    After a short overview of the historical developments of the technique of gas-assisted focused electron beam-induced processing (mostly deposition and etching), this paper deals with the applications of this technology to photolithographic mask repair. A commented list of results is shown on different mask types, for different types of defects, and at different node generations. The scope of this article is double: summarize the state of the art in a fast-paced highly specific industrial environment driven by "Moore's law" and feedback to academic researchers some technologically relevant directions for further investigations.

  14. Improved electron-beam welding technique

    NASA Technical Reports Server (NTRS)

    Schumacher, B.

    1970-01-01

    Electron-beam generator produces high quality welds without vaporization by relying on the mobility and hydrodynamic properties of the material in its liquid phase. The power density of the beam is relative to the speed of the workpiece, producing an inclined weld-front.

  15. Adjusting an electron beam for drilling

    NASA Technical Reports Server (NTRS)

    Childress, C. L.

    1980-01-01

    Reticle contains two concentric circles: inner circle insures beam circularity and outer circle is guide to prevent beam from cutting workpiece clamp. Precise measurement of beam and clamp are required with old reticle. New reticle speeds up electron-beam drilling process by eliminating need to rotate eyepiece to make measurements against reticle scale.

  16. Electron Beam Applications in Chemical Processing

    NASA Astrophysics Data System (ADS)

    Martin, D.; Dragusin, M.; Radoiu, M.; Moraru, R.; Oproiu, C.; Cojocaru, G.; Margarit, C.

    1997-05-01

    Our recent results in the field of polymeric materials obtained by electron beam irradiation are presented. Two types of polymeric flocculants and three hydrogels are described. The effects of radiation absorbed dose and chemical composition of the irradiated solutions upon the polymeric materials characteristics are discussed. The required absorbed dose levels to produce the polymeric flocculants are in the range of 0.4 kGy to 1 kGy, and 4 kGy to 12 kGy for hydrogels. Experimental results obtained by testing polymeric flocculants with waste water from food industry are given. Plymeric materials processing was developed on a pilot small scale level with a 0.7 kW and 5.5 MeV linac built in Romania. A new facility for application of combined electron beam and microwave irradiation in the field of polymeric materials preparation is presently under investigation. Preliminary results have demonstrated that some polymeric flocculants characteristics, such as linearity, were improved by using combined electron beam and microwave irradiation. Also, the absorbed dose levels decreases in comparison with those required when only electron beam irradiation was used.

  17. A reflex electron beam discharge as a plasma source for electron beam generation

    SciTech Connect

    Murray, C.S.; Rocca, J.J.; Szapiro, B. )

    1988-10-01

    A reflex electron beam glow discharge has been used as a plasma source for the generation of broad-area electron beams. An electron current of 120 A (12 A/cm/sup 2/) was extracted from the plasma in 10 ..mu..s pulses and accelerated to energies greater than 1 keV in the gap between two grids. The scaling of the scheme for the generation of multikiloamp high-energy beams is discussed.

  18. Electron beam depolarization in a damping ring

    SciTech Connect

    Minty, M.

    1993-04-01

    Depolarization of a polarized electron beam injected into a damping ring is analyzed by extending calculations conventionally applied to proton synchrotrons. Synchrotron radiation in an electron ring gives rise to both polarizing and depolarizing effects. In a damping ring, the beam is stored for a time much less than the time for self polarization. Spin flip radiation may therefore be neglected. Synchrotron radiation without spin flips, however, must be considered as the resonance strength depends on the vertical betatron oscillation amplitude which changes as the electron beam is radiation damped. An expression for the beam polarization at extraction is derived which takes into account radiation damping. The results are applied to the electron ring at the Stanford Linear Collider and are compared with numerical matrix formalisms.

  19. Electron Beam Scanning in Industrial Applications

    NASA Astrophysics Data System (ADS)

    Jongen, Yves; Herer, Arnold

    1996-05-01

    Scanned electron beams are used within many industries for applications such as sterilization of medical disposables, crosslinking of wire and cables insulating jackets, polymerization and degradation of resins and biomaterials, modification of semiconductors, coloration of gemstones and glasses, removal of oxides from coal plant flue gasses, and the curing of advanced composites and other molded forms. X-rays generated from scanned electron beams make yet other applications, such as food irradiation, viable. Typical accelerators for these applications range in beam energy from 0.5MeV to 10 MeV, with beam powers between 5 to 500kW and scanning widths between 20 and 300 cm. Since precise control of dose delivery is required in many of these applications, the integration of beam characteristics, product conveyance, and beam scanning mechanisms must be well understood and optimized. Fundamental issues and some case examples are presented.

  20. Electron beam facility for divertor target experiments

    SciTech Connect

    Anisimov, A.; Gagen-Torn, V.; Giniyatulin, R.N.

    1994-12-31

    To test different concepts of divertor targets and bumpers an electron beam facility was assembled in Efremov Institute. It consists of a vacuum chamber (3m{sup 3}), vacuum pump, electron beam gun, manipulator to place and remove the samples, water loop and liquid metal loop. The following diagnostics of mock-ups is stipulated: (1) temperature distribution on the mock-up working surface (scanning pyrometer and infra-red imager); (2) temperature distribution over mocked-up thickness in 3 typical cross-sections (thermo-couples); (3) cracking dynamics during thermal cycling (acoustic-emission method), (4) defects in the mock-up before and after tests (ultra-sonic diagnostics, electron and optical microscopes). Carbon-based and beryllium mock-ups are made for experimental feasibility study of water and liquid-metal-cooled divertor/bumper concepts.

  1. Electron beam targets vapor-phase contaminants

    SciTech Connect

    1995-07-01

    Electron-beam bombardment has long been known to break down complex molecules. Zapit Technology, Inc. (Santa Clara, California) is in the process of commercializing a treatment system, tested in conjunction with the Lawrence Livermore National Laboratory, which uses electron beams to destroy vapor-phase toxic wastes. Drawing relatively low-power beams, the system is said to offer a low-cost way to oxidize chlorinated and non-chlorinated organic compounds. The unit has been developed to treat vapor-phase organic wastes at temperatures less than 400 F, and at ambient pressures. Candidates streams include process of gases, and organics collected during soil-vapor extraction or stripped from wastewater and groundwater streams. Inside the Zapit treatment unit, a continuous stream of ionizing electrons is generated by a cathode and is accelerated to nearly the speed of light through a metal grid. As the pollutant stream passes through the reaction chamber, it is bombarded by this electron beam. In the process, complex organic molecules are broken down into water, carbon dioxide, and, if chlorinated compounds are present, hydrochloric acid. During groundwater treatment, an air stripper converts dissolved organics in a vapor phase, which is passed through the electron-beam unit. The offgases from the Zapit unit are passed through an acid scrubber (using sodium hydroxide) to neutralize any byproduct HCl and through a carbon-adsorption unit for final polishing. Industrial offgases can be fed directly into the Zapit treatment unit, without the intermediate air stripper. Electrical power requirements are relatively low.

  2. Electron-beam distillation of natural polymers

    NASA Astrophysics Data System (ADS)

    Ponomarev, A. V.; Makarov, I. E.; Ershov, B. G.

    2014-01-01

    Pyrolysis of cellulose, lignin, and chitin may be upgraded by the use of an electron-beam irradiation. The radiation-thermal destruction mode does more probable production of liquid low-molecular-weight products instead of solid pyrolitic oligomers. Furans, methoxyphenols, and pyridines are dominant products of high-temperature radiolysis of cellulose, lignin, and chitin, respectively. The mechanism of chain destruction of natural polymers is considered.

  3. Separating Isotopes With Laser And Electron Beams

    NASA Technical Reports Server (NTRS)

    Trajmar, Sandor

    1989-01-01

    Need for second laser eliminated. In scheme for separation of isotopes, electrons of suitable kinetic energy ionize specific isotope excited by laser beam in magnetic field. Ionization by electron beams cheap and efficient in comparison to ionization by laser beams, and requires no special technical developments. Feasibility of new scheme demonstrated in selective ionization of Ba138, making possible separation of isotope from Ba isotopes of atomic weight 130, 132, 134, 135, 136, and 137.

  4. Preventing Contamination In Electron-Beam Welds

    NASA Technical Reports Server (NTRS)

    Goodin, Wesley D.; Gulbrandsen, Kevin A.; Oleksiak, Carl

    1990-01-01

    Simple expedient eliminates time-consuming, expensive manual hand grinding. Use of groove and backup tube greatly reduces postweld cleanup in some electron-beam welding operations. Tube-backup method developed for titanium parts, configurations of which prevents use of solid-block backup. In new welding configuration, tube inserted in groove to prevent contact between alumina beads and molten weld root. When welding complete and beads and tube removed, only minor spatter remains and is ground away easily.

  5. Electron-beam welder circle generator

    NASA Technical Reports Server (NTRS)

    Burley, R. K.

    1980-01-01

    Generator rotates electron beam and performs other convenient functions during welding process. Device eliminates time-consuming techniques relying heavily on operator's skill. Welding speed is varied with frequency selector, and amplitudes of x- and y-axes are varied by adjusting phase shift. Both high and low-range adjustments are available, and each axis can be separately controlled. Crosshair is provided for set-up and beam alinements.

  6. Further remarks on electron beam pumping of laser materials.

    PubMed

    Klein, C A

    1966-12-01

    This article demonstrates that recently completed studies on the energy dissipation of kilovolt electron beams in solids provide readily applicable methods for assessing the situation in electron beam pumped lasers. PMID:20057662

  7. Gamma Putty dosimetric studies in electron beam.

    PubMed

    Gloi, Aime M

    2016-01-01

    Traditionally, lead has been used for field shaping in megavoltage electron beams in radiation therapy. In this study, we analyze the dosimetric parameters of a nontoxic, high atomic number (Z = 83), bismuth-loaded material called Gamma Putty that is malleable and can be easily molded to any desired shape. First, we placed an ionization chamber at different depths in a solid water phantom under a Gamma Putty shield of thickness (t = 0, 3, 5, 10, 15, 20, and 25 mm, respectively) and measured the ionizing radiation on the central axis (CAX) for electron beam ranging in energies from 6 to 20 MeV. Next, we investigated the relationship between the relative ionization (RI) measured at a fixed depth for several Gamma Putty shield at different cutout diameters ranging from 2 to 5 cm for various beam energies and derived an exponential fitting equation for clinical purposes. The dose profiles along the CAX show that bremsstrahlung dominates for Gamma Putty thickness >15 mm. For high-energy beams (12-20 MeV) and all Gamma Putty thicknesses up to 25 mm, RI below 5% could not be achieved due to the strong bremsstrahlung component. However, Gamma Putty is a very suitable material for reducing the transmission factor below 5% and protecting underlying normal tissues for low-energy electron beams (6-9 MeV). PMID:27651563

  8. Gamma Putty dosimetric studies in electron beam

    PubMed Central

    Gloi, Aime M.

    2016-01-01

    Traditionally, lead has been used for field shaping in megavoltage electron beams in radiation therapy. In this study, we analyze the dosimetric parameters of a nontoxic, high atomic number (Z = 83), bismuth-loaded material called Gamma Putty that is malleable and can be easily molded to any desired shape. First, we placed an ionization chamber at different depths in a solid water phantom under a Gamma Putty shield of thickness (t = 0, 3, 5, 10, 15, 20, and 25 mm, respectively) and measured the ionizing radiation on the central axis (CAX) for electron beam ranging in energies from 6 to 20 MeV. Next, we investigated the relationship between the relative ionization (RI) measured at a fixed depth for several Gamma Putty shield at different cutout diameters ranging from 2 to 5 cm for various beam energies and derived an exponential fitting equation for clinical purposes. The dose profiles along the CAX show that bremsstrahlung dominates for Gamma Putty thickness >15 mm. For high-energy beams (12–20 MeV) and all Gamma Putty thicknesses up to 25 mm, RI below 5% could not be achieved due to the strong bremsstrahlung component. However, Gamma Putty is a very suitable material for reducing the transmission factor below 5% and protecting underlying normal tissues for low-energy electron beams (6–9 MeV).

  9. Gamma Putty dosimetric studies in electron beam

    PubMed Central

    Gloi, Aime M.

    2016-01-01

    Traditionally, lead has been used for field shaping in megavoltage electron beams in radiation therapy. In this study, we analyze the dosimetric parameters of a nontoxic, high atomic number (Z = 83), bismuth-loaded material called Gamma Putty that is malleable and can be easily molded to any desired shape. First, we placed an ionization chamber at different depths in a solid water phantom under a Gamma Putty shield of thickness (t = 0, 3, 5, 10, 15, 20, and 25 mm, respectively) and measured the ionizing radiation on the central axis (CAX) for electron beam ranging in energies from 6 to 20 MeV. Next, we investigated the relationship between the relative ionization (RI) measured at a fixed depth for several Gamma Putty shield at different cutout diameters ranging from 2 to 5 cm for various beam energies and derived an exponential fitting equation for clinical purposes. The dose profiles along the CAX show that bremsstrahlung dominates for Gamma Putty thickness >15 mm. For high-energy beams (12–20 MeV) and all Gamma Putty thicknesses up to 25 mm, RI below 5% could not be achieved due to the strong bremsstrahlung component. However, Gamma Putty is a very suitable material for reducing the transmission factor below 5% and protecting underlying normal tissues for low-energy electron beams (6–9 MeV). PMID:27651563

  10. High energy electron beams for ceramic joining

    SciTech Connect

    Turman, B.N.; Glass, S.J.; Halbleib, J.A.; Helmich, D.R.; Loehman, R.E.; Clifford, J.R.

    1994-12-31

    Joining of structural ceramics is possible using high melting point metals such as Mo and Pt that are heated with a high energy electron beam, with the potential for high temperature joining. A 10 MeV electron beam can penetrate through 1 cm of ceramic, offering the possibility of buried interface joining. Because of transient heating and the lower heat capacity of the metal relative to the ceramic, a pulsed high power beam has the potential for melting the metal without decomposing or melting the ceramic. We have demonstrated the feasibility of the process with a series of 10 MeV, 1 kW electron beam experiments. Shear strengths up to 28 MPa have been measured. This strength is comparable to that reported in the literature for bonding silicon nitride to molybdenum with copper-silver-titanium braze, but weaker than that reported for Si{sub 3}N{sub 4}-Si{sub 3}N{sub 4} with gold-nickel braze. The bonding mechanism appears to be a thin silicide layer.

  11. Electron beam coupling to a metamaterial structure

    SciTech Connect

    French, David M.; Shiffler, Don; Cartwright, Keith

    2013-08-15

    Microwave metamaterials have shown promise in numerous applications, ranging from strip lines and antennas to metamaterial-based electron beam driven devices. In general, metamaterials allow microwave designers to obtain electromagnetic characteristics not typically available in nature. High Power Microwave (HPM) sources have in the past drawn inspiration from work done in the conventional microwave source community. In this article, the use of metamaterials in an HPM application is considered by using an effective medium model to determine the coupling of an electron beam to a metamaterial structure in a geometry similar to that of a dielectric Cerenkov maser. Use of the effective medium model allows for the analysis of a wide range of parameter space, including the “mu-negative,”“epsilon-negative,” and “double negative” regimes of the metamaterial. The physics of such a system are modeled analytically and by utilizing the particle-in-cell code ICEPIC. For this geometry and effective medium representation, optimum coupling of the electron beam to the metamaterial, and thus the optimum microwave or RF production, occurs in the epsilon negative regime of the metamaterial. Given that HPM tubes have been proposed that utilize a metamaterial, this model provides a rapid method of characterizing a source geometry that can be used to quickly understand the basic physics of such an HPM device.

  12. Wiring of metallized microtubules by electron beam-induced structuring

    NASA Astrophysics Data System (ADS)

    Fritzsche, Wolfgang; Köhler, J. Michael; Böhm, Konrad J.; Unger, Eberhard; Wagner, Thomas; Kirsch, Remo; Mertig, Michael; Pompe, Wolfgang

    1999-09-01

    Molecular electronics emerge as a possibility to continue the miniaturization of electronic circuits down to the lower nanometre scale. One significant challenge is the electrical connection of molecular devices by nanowires. We present here the realization of a new approach for the wiring of nanostructures by linking metallized microtubules (MTs) to prestructured microelectrodes. MTs (tube-like protein structures) were metallized and deposited on microstructured substrates. Electron beam-induced deposition was used for structuring connecting gold lines as nanoelectrodes, which wire a single MT to microelectrodes created by photolithography. Initial electrical measurements confirmed the suitability of the set-up for linking nanometre-scale structures to a measurement device. A metallized MT yielded a resistance below 50 icons/Journals/Common/Omega" ALT="Omega" ALIGN="TOP"/> over the length of 1 µm.

  13. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    SciTech Connect

    Schmied, Roland; Fowlkes, Jason Davidson; Winkler, Robert; Rack, Phillip D.; Plank, Harald

    2015-02-16

    In this study, we explore lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. In addition, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.

  14. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    DOE PAGESBeta

    Schmied, Roland; Fowlkes, Jason Davidson; Winkler, Robert; Rack, Phillip D.; Plank, Harald

    2015-02-16

    In this study, we explore lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. In addition, it is demonstrated that intermediate energies lead to evenmore » more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.« less

  15. Fundamental edge broadening effects during focused electron beam induced nanosynthesis

    PubMed Central

    Schmied, Roland; Fowlkes, Jason D; Winkler, Robert; Rack, Phillip D

    2015-01-01

    Summary The present study explores lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. Moreover, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution. PMID:25821687

  16. Electron Beam Induced Damage of MOS Gate Oxide

    NASA Astrophysics Data System (ADS)

    Konishi, Morikazu; Kubota, Michitaka; Koike, Kaoru

    1998-03-01

    Threshold voltage (Vth) shift of a metal oxide semiconductor (MOS) system due to electron beam (EB) exposure can be expressed quantitatively as a function of the EB dosage which was derived easily as a solution of a differential equation based on the hole capturing model in the gate oxide. The theoretical model assumes two steps for hole capturing. First is the hole capturing by intrinsic hole traps leading to steep Vth shift with EB dosage at early exposure stages. The second is the hole capturing by newborn hole traps due to the EB injection, leading to a rather slow Vth variation at a higher EB dosage. The model shows good agreement with the experimental result over a wide range of electron beam dosages. Moreover, hole injection efficiency in the gate oxide is found to be higher for the third Aluminum interconnection layer exposure than for the first Al layer, corresponding to higher deposition energy around the gate oxide obtained by the Monte Carlo simulation result.

  17. Electron beam welding produces improved duplex crack arrest specimens

    SciTech Connect

    King, J.F.; Hudson, J.D.

    1988-01-01

    The crack arrest toughness, K/sub Ia/, is generally determined using a monolithic compact type specimen which contains a brittle weld bead to act as a crack initiation site. To test at higher temperatures and toughnesses, electron beam (EB) welded duplex specimens were fabricated. These specimens required the joining of hardened 4340 steel, which acts as the crack initiator, to A533 grade B class 1 steel base material and submerged arc welds in this base metal. The successful fabrication of these specimens required the development of an EB welding procedure with a very narrow heat-affected zone (HAZ). A technique was also developed to eliminate the porosity which was always present in the EB welds through the submerged arc weld deposit region of the joint. The technique involved remelting the joint surface of the A533 steel containing the submerged arc weld to a controlled depth using an oscillated electron beam. This remelt in vacuum reduced the gaseous constituents to low levels and prevented porosity from forming in the deep penetration EB welds between this surface and the 4340 steel.

  18. Electron beam control rf discharges for plasma processing

    SciTech Connect

    Kushner, M.J.; Ruzic, D.N.; Yang, J.

    1995-12-31

    Reactive Ion Etching (RIE) discharges for microelectronics fabrication suffer from the inability to separately control plasma density and ion power flux to the wafer. Inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) reactors have been developed to provide some degree of independent control. This is accomplished by arranging for ionization to be provided dominantly by the applied electromagnetic instead of the rf bias to the substrate. Both ICP and ECR reactors, though, optimally operate at low gas pressures, and are not typically used for intermediate to high pressure etching and deposition systems. To address the higher pressure range, a hybrid electron beam/RIE discharge system (EB-RIE) has been developed. In the EB-RIE system, a planar electron beam (1--3 kV) is injected into the plasma chamber above and parallel to the wafer. An rf bias is separately applied to the substrate. A 2-dimensional model of the EB-RIE reactor has been developed to investigate the scaling of the device and analyze previous experimental measurements. Results from the model are discussed for Ar and Ar/SiH{sub 4} gas mixtures in which the beam energy, gas pressure and positioning of the beam are varied.

  19. Facile electron-beam lithography technique for irregular and fragile substrates

    SciTech Connect

    Chang, Jiyoung; Zhou, Qin; Zettl, Alex

    2014-10-27

    A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

  20. Facile electron-beam lithography technique for irregular and fragile substrates

    NASA Astrophysics Data System (ADS)

    Chang, Jiyoung; Zhou, Qin; Zettl, Alex

    2014-10-01

    A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

  1. The calculation of the dynamics of interaction between intense electron beams and dielectrics

    SciTech Connect

    Milyavskii, V.V.; Skvortsov, V.A.

    1995-09-01

    A mathematical model is constructed and a numerical investigation performed of the interaction between an intense relativistic electron beam and a solid high-molecular dielectric. The model is based on the equations of mechanics of continuum, electrodynamics, and kinetics, describing the accumulation and relaxation of space charge and shock-wave processes, as well as the evolution of electric field in the sample. A semiempirical procedure is proposed for the calculation of energy deposition by an electron beam in a target in the presence of a nonuniform electric field.

  2. PURIFICATION OF IRIDIUM BY ELECTRON BEAM MELTING

    SciTech Connect

    Ohriner, Evan Keith

    2008-01-01

    The purification of iridium metal by electron beam melting has been characterized for 48 impurity elements. Chemical analysis was performed by glow discharge mass spectrographic (GDMS) analysis for all elements except carbon, which was analyzed by combustion. The average levels of individual elemental impurities in the starting powder varied from 37 g/g to 0.02 g/g. The impurity elements Li, Na, Mg, P, S, Cl, K, Ca, Mn, Co, Ni, Cu, Zn, As, Pd, Ag, Cd, Sn, Sb, Te, Ba, Ce, Tl, Pb, and Bi were not detectable following the purification. No significant change in concentration of the elements Ti, V, Zr, Nb, Mo, and Re was found. The elements B, C, Al, Si, Cr, Fe, Ru, Rh, and Pt were partially removed by vaporization during electron beam melting. Langmuir's equation for ideal vaporization into a vacuum was used to calculate for each impurity element the expected ratio of impurity content after melting to that before melting. Equilibrium vapor pressures were calculated using Henry's law, with activity coefficients obtained from published data for the elements Fe, Ti, and Pt. Activity coefficients were estimated from enthalpy data for Al, Si, V, Cr, Mn, Co, Ni, Zr, Nb, Mo, and Hf and an ideal solution model was used for the remaining elements. The melt temperature was determined from measured iridium weight loss. Excellent agreement was found between measured and calculated impurity ratios for all impurity elements. The results are consistent with some localized heating of the melt pool due to rastering of the electron beam, with an average vaporization temperature of 3100 K as compared to a temperature of 2965 K calculated for uniform heating of the melt pool. The results are also consistent with ideal mixing in the melt pool.

  3. Electron beam ion source and electron beam ion trap (invited)a)

    NASA Astrophysics Data System (ADS)

    Becker, Reinard; Kester, Oliver

    2010-02-01

    The electron beam ion source (EBIS) and its trap variant [electron beam ion trap (EBIT)] celebrated their 40th and 20th anniversary, respectively, at the EBIS/T Symposium 2007 in Heidelberg. These technologically challenging sources of highly charged ions have seen a broad development in many countries over the last decades. In contrast to most other ion sources the recipe of improvement was not "sorcery" but a clear understanding of the physical laws and obeying the technological constraints. This review will report important achievements of the past as well as promising developments in the future.

  4. Intense steady state electron beam generator

    DOEpatents

    Hershcovitch, A.; Kovarik, V.J.; Prelec, K.

    1990-07-17

    An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source. 2 figs.

  5. Intense steady state electron beam generator

    DOEpatents

    Hershcovitch, Ady; Kovarik, Vincent J.; Prelec, Krsto

    1990-01-01

    An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source.

  6. Electron beam induced growth of tin whiskers

    SciTech Connect

    Vasko, A. C.; Karpov, V. G.; Warrell, G. R.; Parsai, E. I.; Shvydka, Diana

    2015-09-28

    We have investigated the influence of electron irradiation on tin whisker growth. Sputtered tin samples exposed to electron beam of 6 MeV energy exhibited fast whisker growth, while control samples did not grow any whiskers. The statistics of e-beam induced whiskers was found to follow the log-normal distribution. The observed accelerated whisker growth is attributed to electrostatic effects due to charges trapped in an insulating substrate. These results offer promise for establishing whisker-related accelerated life testing protocols.

  7. Linac Coherent Light Source Electron Beam Collimation

    SciTech Connect

    Wu, J.; Dowell, D.; Emma, P.; Limborg-Deprey, C.; Schmerge, J.F.; /SLAC

    2007-04-27

    This paper describes the design and simulation of the electron beam collimation system in the Linac Coherent Light Source (LCLS). Dark current is expected from the gun and some of the accelerating cavities. Particle tracking of the expected dark current through the entire LCLS linac, from gun through FEL undulator, is used to estimate final particle extent in the undulator as well as expected beam loss at each collimator or aperture restriction. A table of collimators and aperture restrictions is listed along with halo particle loss results, which includes an estimate of average continuous beam power lost. In addition, the transverse wakefield alignment tolerances are calculated for each collimator.

  8. Short rise time intense electron beam generator

    DOEpatents

    Olson, Craig L.

    1987-01-01

    A generator for producing an intense relativistic electron beam having a subnanosecond current rise time includes a conventional generator of intense relativistic electrons feeding into a short electrically conductive drift tube including a cavity containing a working gas at a low enough pressure to prevent the input beam from significantly ionizing the working gas. Ionizing means such as a laser simultaneously ionize the entire volume of working gas in the cavity to generate an output beam having a rise time less than one nanosecond.

  9. Short rise time intense electron beam generator

    DOEpatents

    Olson, C.L.

    1984-03-16

    A generator for producing an intense relativisitc electron beam having a subnanosecond current rise time includes a conventional generator of intense relativistic electrons feeding into a short electrically conductive drift tube including a cavity containing a working gas at a low enough pressure to prevent the input beam from significantly ionizing the working gas. Ionizing means such as a laser simultaneously ionize the entire volume of working gas in the cavity to generate an output beam having a rise time less than one nanosecond.

  10. LHC particle collimation with hollow electron beams

    SciTech Connect

    Shiltsev, V.; Drozhdin, A.; Kamerdzhiev, V.; Kuznetsov, G.; Vorobiev, L.; /Fermilab

    2008-06-01

    Electron lenses built and installed in the Tevatron have proven themselves as safe and very reliable instruments which can be effectively used in hadron collider operation for a number of applications, including compensation of beam-beam effects [1], a DC beam removal from abort gaps [2], and as a versatile diagnostic tool. In this article, we--following the original proposal [3,4]--consider in more detail a possibility of using electron lenses with hollow electron beam for ion and proton collimation in LHC and the Tevatron.

  11. Decarburization of uranium via electron beam processing

    SciTech Connect

    McKoon, R H

    1998-10-23

    For many commercial and military applications, the successive Vacuum Induction Melting of uranium metal in graphite crucibles results in a product which is out of specification in carbon. The current recovery method involves dissolution of the metal in acid and chemical purification. This is both expensive and generates mixed waste. A study was undertaken at Lawrence Livermore National Laboratory to investigate the feasibility of reducing the carbon content of uranium metal using electron beam techniques. Results will be presented on the rate and extent of carbon removal as a function of various operating parameters.

  12. Susceptor heating device for electron beam brazing

    DOEpatents

    Antieau, Susan M.; Johnson, Robert G. R.

    1999-01-01

    A brazing device and method are provided which locally apply a controlled amount of heat to a selected area, within a vacuum. The device brazes two components together with a brazing metal. A susceptor plate is placed in thermal contact with one of the components. A serrated pedestal supports the susceptor plate. When the pedestal and susceptor plate are in place, an electron gun irradiates an electron beam at the susceptor plate such that the susceptor plate is sufficiently heated to transfer heat through the one component and melt the brazing metal.

  13. Pulsed electron beam emission in space

    NASA Technical Reports Server (NTRS)

    Neubert, T.; Hawkins, J. G.; Reeves, G. D; Banks, P. M.; Bush, R. I

    1988-01-01

    During the Spacelab-2 mission of July 1985, electron beams (1 keV, 50-150 mA) pulsed at ELF and VLF frequencies were emitted from the Space Shuttle Orbiter. The wave fields generated by the beam were monitored by a Plasma Diagnostics Package which was released as a free-flying subsatellite during a six hour period. Measurements of the Orbiter potential and the return current during beam emissions were obtained from a Charge and Current Probe mounted in the payload bay.

  14. Investigation of industrial-scale carbon dioxide reduction using pulsed electron beams

    NASA Astrophysics Data System (ADS)

    Petrov, G. M.; Apruzese, J. P.; Petrova, Tz. B.; Wolford, M. F.

    2016-03-01

    Carbon dioxide is the most important greenhouse gas contributing to global warming. To help mitigate increasing CO2 concentrations, we investigate a method of carbon dioxide reduction using high-power electron beams, which can be used on an industrial scale. A series of experiments are conducted in which the reduction of CO2 is measured for different gas compositions and power deposition rates. An electron beam deposition model is applied to compute reduction rates of CO2 and energy cost for breaking a CO2 molecule in flue gas and pure carbon dioxide at atmospheric pressure. For flue gas consisting of 82% N2, 6% O2, and 12% CO2, the calculated energy cost is 85 eV per molecule. In order to dissociate 50% of the CO2 molecules, beam energy density deposition on the order of 20 J/cm3 is required. Electron beam irradiation of 12.6 liter gas volume containing 90% CO2 and 10% CH4 at beam energy density deposition of 4.2 J/cm3, accumulated over 43 shots in a 20 min interval, reduced the CO2 concentration to 78%. Analogous experiments with a gas mixture containing 11.5% CO2, 11.5% CH4, and balance of Ar, reduced the CO2 concentration to below 11% with energy deposition 0.71 J/cm3, accumulated over 10 shots in a 5 min interval. The experimental data and the theoretical predictions of CO2 reduction using pulsed electron beams are in agreement within the experimental error. Other techniques to enhance the removal of CO2 with pulsed electron beams are also explored, yielding new possible avenues of research.

  15. Coating synthesis controlled by electron-beam heating

    NASA Astrophysics Data System (ADS)

    Gordienko, A. I.; Knyazeva, A. G.; Pobol, I. L.

    2016-07-01

    The methods of combined electron-beam treatment of parts made of steel with one- and two-layer coatings are studied experimentally. Ti-Ni, Ni-Al and Al-Ti systems were used as the examples in the experiments. The mathematical model is suggested for coating formation in the controlled regime of high temperature synthesis during high energy source motion along the preliminarily deposited layer of exothermic composition. The study takes into account the difference in thermophysical properties of the materials of coating and substrate, heat release from chemical reaction that leads to the coating properties formation and other factors. The realization of the synthesis depends on technological parameters. Various regimes of the treatment process are investigated numerically.

  16. Electron beam-assisted healing of nanopores in magnesium alloys

    NASA Astrophysics Data System (ADS)

    Zheng, He; Liu, Yu; Cao, Fan; Wu, Shujing; Jia, Shuangfeng; Cao, Ajing; Zhao, Dongshan; Wang, Jianbo

    2013-05-01

    Nanopore-based sensing has emerged as a promising candidate for affordable and powerful DNA sequencing technologies. Herein, we demonstrate that nanopores can be successfully fabricated in Mg alloys via focused electron beam (e-beam) technology. Employing in situ high-resolution transmission electron microscopy techniques, we obtained unambiguous evidence that layer-by-layer growth of atomic planes at the nanopore periphery occurs when the e-beam is spread out, leading to the shrinkage and eventual disappearance of nanopores. The proposed healing process was attributed to the e-beam-induced anisotropic diffusion of Mg atoms in the vicinity of nanopore edges. A plausible diffusion mechanism that describes the observed phenomena is discussed. Our results constitute the first experimental investigation of nanopores in Mg alloys. Direct evidence of the healing process has advanced our fundamental understanding of surface science, which is of great practical importance for many technological applications, including thin film deposition and surface nanopatterning.

  17. Transverse profile imager for ultrabright electron beams

    NASA Astrophysics Data System (ADS)

    Ischebeck, Rasmus; Prat, Eduard; Thominet, Vincent; Ozkan Loch, Cigdem

    2015-08-01

    A transverse profile imager for ultrabright electron beams is presented, which overcomes resolution issues in present designs by observing the Scheimpflug imaging condition as well as the Snell-Descartes law of refraction in the scintillating crystal. Coherent optical transition radiation emitted by highly compressed electron bunches on the surface of the crystal is directed away from the camera, allowing to use the monitor for profile measurements of electron bunches suitable for X-ray free electron lasers. The optical design has been verified by ray tracing simulations, and the angular dependency of the resolution has been verified experimentally. An instrument according to the presented design principles has been used in the SwissFEL Injector Test Facility, and different scintillator materials have been tested. Measurements in conjunction with a transverse deflecting radiofrequency structure and an array of quadrupole magnets demonstrate a normalized slice emittance of 25 nm in the core of a 30 fC electron beam at a pulse length of 10 ps and a particle energy of 230 MeV.

  18. Purification of Niobium by Electron Beam Melting

    NASA Astrophysics Data System (ADS)

    Sankar, M.; Mirji, K. V.; Prasad, V. V. Satya; Baligidad, R. G.; Gokhale, A. A.

    2016-06-01

    Pure niobium metal, produced by alumino-thermic reduction of niobium oxide, contains various impurities which need to be reduced to acceptable levels to obtain aerospace grade purity. In the present work, an attempt has been made to refine niobium metals by electron beam drip melting technique to achieve purity confirming to the ASTM standard. Input power to the electron gun and melt rate were varied to observe their combined effect on extend of refining and loss of niobium. Electron beam (EB) melting is shown to reduce alkali metals, trace elements and interstitial impurities well below the specified limits. The reduction in the impurities during EB melting is attributed to evaporation and degassing due to the combined effect of high vacuum and high melt surface temperature. The % removal of interstitial impurities is essentially a function of melt rate and input power. As the melt rate decreases or input power increases, the impurity levels in the solidified niobium ingot decrease. The EB refining process is also accompanied by considerable amount of niobium loss, which is attributed to evaporation of pure niobium and niobium sub-oxide. Like other impurities, Nb loss increases with decreasing melt rate or increase in input power.

  19. Optics of electron beam in the Recycler

    SciTech Connect

    Burov, Alexey V.; Kazakevich, G.; Kroc, T.; Lebedev, V.; Nagaitsev, S.; Prost, L.; Pruss, S.; Shemyakin, A.; Sutherland, M.; Tiunov, M.; Warner, A.; /Fermilab /Novosibirsk, IYF

    2005-11-01

    Electron cooling of 8.9 GeV/c antiprotons in the Recycler ring (Fermilab) requires high current and good quality of the DC electron beam. Electron trajectories of {approx}0.2 A or higher DC electron beam have to be parallel in the cooling section, within {approx}0.2 mrad, making the beam envelope cylindrical. These requirements yielded a specific scheme of the electron transport from a gun to the cooling section, with electrostatic acceleration and deceleration in the Pelletron. Recuperation of the DC beam limits beam losses at as tiny level as {approx}0.001%, setting strict requirements on the return electron line to the Pelletron and a collector. To smooth the beam envelope in the cooling section, it has to be linear and known at the transport start. Also, strength of the relevant optic elements has to be measured with good accuracy. Beam-based optic measurements are being carried out and analyzed to get this information. They include beam simulations in the Pelletron, differential optic (beam response) measurements and simulation, beam profile measurements with optical transition radiation, envelope measurements and analysis with orifice scrapers. Current results for the first half-year of commissioning are presented. Although electron cooling is already routinely used for pbar stacking, its efficiency is expected to be improved.

  20. Electron beams in research and technology

    NASA Astrophysics Data System (ADS)

    Mehnert, R.

    1995-11-01

    Fast electrons lose their energy by inelastic collisions with electrons of target molecules forming secondary electrons and excited molecules. Coulomb interaction of secondary electrons with valence electrons of neighboring molecules leads to the formation of radical cations, thermalized electrons, excited molecular states and radicals. The primary reactive species initiate chemical reactions in the materials irradiated. Polymer modifications using accelerated electrons such as cross-linking of cable insulation, tubes, pipes and moldings, vulcanization of elastomers, grafting of polymer surfaces, processing of foamed plastics and heat shrinkable materials have gained wide industrial acceptance. A steadily growing electron beam technology is curing of paints, lacquers, printing inks and functional coatings. Electron beam processing offers high productivity, the possibility to treat the materials at normal temperature and pressure, excellent process control and clean production conditions. On an industrial scale the most important application of fast electrons is curing of 100% reactive monomer/prepolymer systems. Mainly acrylates and epoxides are used to formulate functional coatings on substrates such as paper, foil, wood, fibre board and high pressure laminates. A survey is given about the reaction mechanism of curing, the characterization of cured coatings, and of some industrial application.

  1. Electron-beam furnace with magnetic stabilization

    SciTech Connect

    Harker, H.R.; Knecht, J.A. II

    1986-10-07

    This patent describes an electron-beam comprising: a. An evacuable chamber having a port for coupling the chamber to vacuum pump means; b. a trough-shaped hearth within the chamber for holding material to be melted, the hearth having a spout for issuing a flow of molten material therefrom; c. a crucible positioned within the chamber for receiving molten material flowing from the hearth; d. one or more electron guns each for producing an energetic beam of electrons, each electron gun being positioned a relatively large distance away from the hearth and the crucible; e. magnetic beam deflection means forming an integral part of each electron gun for scanning and shaping the beam produced thereby across the hearth or the crucible; and f. magnetic means adjacent to the hearth and the crucible for producing a relatively weak magnetic field in the vicinity of the hearth and the crucible for preventing erratic deflections of the scanning electron beams without significantly altering the trajectories of such beams.

  2. Metallurgical Mechanisms Controlling Mechanical Properties of Aluminum Alloy 2219 Produced By Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Domack, Marcia S.; Taminger, Karen M. B.; Begley, Matthew

    2006-01-01

    The electron beam freeform fabrication (EBF3) layer-additive manufacturing process has been developed to directly fabricate complex geometry components. EBF3 introduces metal wire into a molten pool created on the surface of a substrate by a focused electron beam. Part geometry is achieved by translating the substrate with respect to the beam to build the part one layer at a time. Tensile properties have been demonstrated for electron beam deposited aluminum and titanium alloys that are comparable to wrought products, although the microstructures of the deposits exhibit features more typical of cast material. Understanding the metallurgical mechanisms controlling mechanical properties is essential to maximizing application of the EBF3 process. In the current study, mechanical properties and resulting microstructures were examined for aluminum alloy 2219 fabricated over a range of EBF3 process variables. Material performance was evaluated based on tensile properties and results were compared with properties of Al 2219 wrought products. Unique microstructures were observed within the deposited layers and at interlayer boundaries, which varied within the deposit height due to microstructural evolution associated with the complex thermal history experienced during subsequent layer deposition. Microstructures exhibited irregularly shaped grains, typically with interior dendritic structures, which were described based on overall grain size, morphology, distribution, and dendrite spacing, and were correlated with deposition parameters. Fracture features were compared with microstructural elements to define fracture paths and aid in definition of basic processing-microstructure-property correlations.

  3. Metallurgical Mechanisms Controlling Mechanical Properties of Aluminum Alloy 2219 Produced by Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Domack, Marcia S.; Tainger, Karen M.

    2006-01-01

    The electron beam freeform fabrication (EBF3) layer-additive manufacturing process has been developed to directly fabricate complex geometry components. EBF3 introduces metal wire into a molten pool created on the surface of a substrate by a focused electron beam. Part geometry is achieved by translating the substrate with respect to the beam to build the part one layer at a time. Tensile properties demonstrated for electron beam deposited aluminum and titanium alloys are comparable to wrought products, although the microstructures of the deposits exhibit cast features. Understanding the metallurgical mechanisms controlling mechanical properties is essential to maximizing application of the EBF3 process. Tensile mechanical properties and microstructures were examined for aluminum alloy 2219 fabricated over a range of EBF3 process variables. Unique microstructures were observed within the deposited layers and at interlayer boundaries, which varied within the deposit height due to microstructural evolution associated with the complex thermal history experienced during subsequent layer deposition. Microstructures exhibited irregularly shaped grains with interior dendritic structures, described based on overall grain size, morphology, distribution, and dendrite spacing, and were correlated with deposition parameters. Fracture features were compared with microstructural elements to define fracture paths and aid in definition of basic processing-microstructure-property correlations.

  4. Silica-Ceria Hybrid Nanostructures

    SciTech Connect

    Munusamy, Prabhakaran; Sanghavi, Shail P.; Nachimuthu, Ponnusamy; Baer, Donald R.; Thevuthasan, Suntharampillai

    2012-04-25

    A new hybrid material system that consists of ceria attached silica nanoparticles has been developed. Because of the versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and versatile properties of silica and antioxidant properties of ceria nanoparticles, this material system is ideally suited for biomedical applications. The silica particles of size ~50nm were synthesized by the Stöber synthesis method and ceria nanoparticles of size ~2-3nm was attached to the silica surface using a hetrocoagulation method. The presence of silanol groups on the surface of silica particles mediated homogenous nucleation of ceria which were attached to silica surface by Si-O-Ce bonding. The formations of silica-ceria hybrid nanostructures were characterized by X-photoelectron spectroscopy (XPS) and high resolution transmission electron microscopy (HRTEM). The HRTEM image confirms the formation of individual crystallites of ceria nanoparticles attached to the silica surface. The XPS analysis indicates that ceria nanoparticles are chemically bonded to surface of silica and possess mixture of +3 and +4 chemical states.

  5. Electrical properties comparison of TiO2/PS/Si devices fabricated by spin coating and electron beam gun

    NASA Astrophysics Data System (ADS)

    Dariani, R. S.; Faraji, F.

    2016-04-01

    Three porous silicon (PS) samples with different porosities by electrochemical anodization are fabricated. Then, TiO2 nanoparticles are deposited on PS by two methods, spin coating and electron beam gun. I- V characteristics of all samples show diode behavior. Our result showed that transient current decreases with increasing porosity for PS/Si samples while increases for TiO2/PS/Si samples in both deposition methods. The reason could be due to filling pores by TiO2 nanoparticles and reduction of resistivity on PS surface. Also, our result showed that transient current increases highly for samples which were deposited by electron beam gun with respect to spin coating. The reason could be that in spin coating method TiO2 sol with high viscosity was used and causes that TiO2 nanoparticles cannot easily penetrate into PS pores. But in electron beam gun method TiO2 nanoparticles reaches to PS surface as a few atoms and can easily penetrate into PS pores. Ideality factor of our samples reduces after TiO2 deposition. Also, ideality factor of samples which were deposited by electron beam gun decreases with respect to spin coating, since transient current and I- V curve slop increase in electron beam gun.

  6. Monte Carlo simulation on a gold nanoparticle irradiated by electron beams.

    PubMed

    Chow, James C L; Leung, Michael K K; Jaffray, David A

    2012-06-01

    This study investigated the secondary electron production from a gold nanoparticle (GNP) irradiated by monoenergetic electron beams using Monte Carlo (MC) simulation. Spherical GNPs with diameters of 2, 50 and 100 nm in water were irradiated by monoenergetic electron beams with energies equal to 50 keV, 250 keV, 1 MeV and 4 MeV. MC simulations were performed using the Geant4 toolkit to determine the energy of the secondary electrons emitted from the GNPs. The mean effective range and deflection angle of the secondary electrons were tracked. Energy depositions inside and outside the nanoparticles due to the secondary electrons were also calculated. For comparisons, simulations were repeated by replacing the GNPs with water. Our results show that the mean effective range of secondary electrons increased with an increase of the GNP size and electron beam energy. For the electron beam energy and GNP size used in this study, the mean effective range was 0.5-15 µm outside the nanoparticle, which is approximately within the dimension of a living cell. The mean deflection angles varied from 78 to 83 degrees as per our MC results. The proportion of energy deposition inside the GNP versus that outside increased with the GNP size. This is different from the results obtained from a previous study using photon beams. The secondary electron energy deposition ratio (energy deposition for GNP/energy deposition for water) was found to be highest for the smallest GNP of 2 nm diameter in this study. For the energy deposited by the secondary electron, we concluded that the addition of GNPs can increase the secondary electron energy deposition in water, though most of the energy was self-absorbed by the large nanoparticles (50 and 100 nm). In addition, an electron source in the presence of GNPs does not seem to be better than photons as the yield of secondary electrons per unit mass of gold is less than water.

  7. Electron Beam Technology for Environmental Pollution Control.

    PubMed

    Chmielewski, Andrzej G; Han, Bumsoo

    2016-10-01

    Worldwide, there are over 1700 electron beam (EB) units in commercial use, providing an estimated added value to numerous products, amounting to 100 billion USD or more. High-current electron accelerators are used in diverse industries to enhance the physical and chemical properties of materials and to reduce undesirable contaminants such as pathogens, toxic byproducts, or emissions. Over the past few decades, EB technologies have been developed aimed at ensuring the safety of gaseous and liquid effluents discharged to the environment. It has been demonstrated that EB technologies for flue gas treatment (SO x and NO x removal), wastewater purification, and sludge hygienization can be effectively deployed to mitigate environmental degradation. Recently, extensive work has been carried out on the use of EB for environmental remediation, which also includes the removal of emerging contaminants such as VOCs, endocrine disrupting chemicals (EDCs), and potential EDCs.

  8. The Electron Beam Semiconductor (EBS) amplifier

    NASA Astrophysics Data System (ADS)

    True, R. M.; Baxendale, J. F.

    1980-07-01

    The Electron Beam Semiconductor (EBS) concept has existed for three decades; but only within the last decade has an active, well-defined program been underway to develop devices that can operate as high-power radio frequency(RF) amplifiers, fast risetime switches, and current and voltage pulse amplifiers. This report discusses the test procedures, data and results of reliability testing of RF and video pulse EBS amplifiers at Electronics Research and Development Command (ERADCOM), Fort Monmouth, New Jersey. Also, the experimental analysis of the series connected diode EBS device is described in detail. Finally, the report concludes with a discussion of the state-of-the-art of EBS and future trends of the technology.

  9. Principle of Terahertz Radiation Using Electron Beams

    NASA Astrophysics Data System (ADS)

    Shin, Young-Min; Choi, Eun-Mi; Park, Gun-Sik

    This part introduces high power THz coherent radiation sources that take advantage of free electron beams. Following a description of characteristics on vacuum electron devices (VEDs), fundamental radiation principle of beam-wave interaction is explained with specifying their types and applications. Conventional high power microwave VEDs such as klystrons, TWTs, gyrotrons, and FELs are described in their technical perspectives with brief overview of device characteristics. Addressing technical challenges on up-conversion-to-THz of conventional approach, this part explores the state-of-the-art micro-VEDs considered for modern THz applications such as communication, imaging, sensing, spectroscopy, and so on, which are combined with modern microfabrication technologies. Novel MEMS techniques to microminiaturize RF components such as electron gun and RF interaction circuits are also presented.

  10. Electron beam analysis of particulate cometary material

    NASA Technical Reports Server (NTRS)

    Bradley, John

    1989-01-01

    Electron microscopy will be useful for characterization of inorganic dust grains in returned comet nucleus samples. The choice of instrument(s) will depend primarily on the nature of the samples, but ultimately a variety of electron-beam methods could be employed. Scanning and analytical (transmission) electron microscopy are the logical choise for morphological, mineralogical, and bulk chemical analyses of dust grains removed from ices. It may also be possible to examine unmelted ice/dust mixtures using an environmental scanning electron microscope equipped with a cryo-transfer unit and a cold stage. Electron microscopic observations of comet nuclei might include: (1) porosities of dust grains; (2) morphologies and microstructures of individual mineral grains; (3) relative abundances of olivine, pyroxene, and glass; and (4) the presence of phases that might have resulted from aqueous alteration (layer silicates, carbonates, sulfates).

  11. The electron beam instability and turbulence theories

    NASA Technical Reports Server (NTRS)

    Dum, C. T.

    1990-01-01

    Extensions and practical applications of recent observations of electron beam-plasma interactions are investigated for the range of turbulence theories, extending from quasi-linear to strong turbulence theory, which have been developed on the basis of the Langmuir-wave excitation model. Electron foreshock observations have indicated that linear instability theory must encompass the excitation of waves whose frequencies are substantially different from those of the plasma frequency; the point of departure for such extensions should be a quantitative test of existing theories, and particle simulations conducive to such testing are presented. A step-by-step addition of physical considerations is used in such simulation studies to differentiate among nonlinear turbulence effects.

  12. Precision fast kickers for kiloampere electron beams

    SciTech Connect

    Caporaso, G.J.; Chen, Y.J.; Weir, J.T.

    1999-10-06

    These kickers will be used to make fast dipoles and quadrupoles which are driven by sharp risetime pulsers to provide precision beam manipulations for high current kA electron beams. This technology will be used on the 2nd axis of the DARHT linac at LANL. It will be used to provide 4 micropulses of pulse width 20 to 120 nsec. selected from a 2 {micro}sec., 2kA, 20MeV macropulse. The fast pulsers will have amplitude modulation capability to compensate for beam-induced steering effects and other slow beam centroid motion to within the bandwidth of the kicker system. Scaling laws derived from theory will be presented along with extensive experimental data obtained on the test bed ETA-II.

  13. MULTIPLE ELECTRON BEAM ION PUMP AND SOURCE

    DOEpatents

    Ellis, R.E.

    1962-02-27

    A vacuum pump is designed which operates by ionizing incoming air and by withdrawing the ions from the system by means of electrical fields. The apparatus comprises a cylindrical housing communicable with the vessel to be evacuated and having a thin wall section in one end. Suitable coils provide a longitudinal magnetic field within the cylinder. A broad cathode and an anode structure is provided to establish a plurality of adjacent electron beams which are parallel to the cylinder axis. Electron reflector means are provided so that each of the beams constitutes a PIG or reflex discharge. Such structure provides a large region in which incoming gas molecules may be ionized by electron bombardment. A charged electrode assembly accelerates the ions through the thin window, thereby removing the gas from the system. The invention may also be utilized as a highly efficient ion source. (AEC)

  14. Probing the magnetsophere with artificial electron beams

    NASA Technical Reports Server (NTRS)

    Winckler, J. R.

    1981-01-01

    An analysis is conducted of the University of Minnesota Electron Echo experiments, which so far have included five sounding rocket experiments. The concept of the Echo experiment is to inject electron beam pulses from a rocket into the ionosphere at altitudes in the range from 100 to 300 km. The electrons move to the conjugate hemisphere following magnetic field lines and return on neighboring field lines to the neighborhood of the rocket where the pulses may be detected and analyzed. Attention is given to the detection and analysis of echoes, the structure of echoes, and the Echo V experiment. The Echo V experiment showed clearly that detection of remote echo beams by atmospheric fluorescence using low light level TV system is not a viable technique. A future experiment is to use throw-away detectors for direct remote echo detection.

  15. Conditioner for a helically transported electron beam

    SciTech Connect

    Wang, Changbiao.

    1992-05-01

    The kinetic theory is developed to investigate a conditioner for a helically transported electron beam. Linear expressions for axial velocity spread are derived. Numerical simulation is used to check the theoretical results and examine nonlinear aspects of the conditioning process. The results show that in the linear regime the action of the beam conditioner on a pulsed beam mainly depends on the phase at which the beam enters the conditioner and depends only slightly on the operating wavelength. In the nonlinear regime, however, the action of the conditioner strongly depends on the operating wavelength and only slightly upon the entrance phase. For a properly chosen operating wavelength, a little less than the electron's relativistic cyclotron wavelength, the conditioner can decrease the axial velocity spread of a pulsed beam down to less than one-third of its initial value.

  16. Conditioner for a helically transported electron beam

    SciTech Connect

    Wang, Changbiao

    1992-05-01

    The kinetic theory is developed to investigate a conditioner for a helically transported electron beam. Linear expressions for axial velocity spread are derived. Numerical simulation is used to check the theoretical results and examine nonlinear aspects of the conditioning process. The results show that in the linear regime the action of the beam conditioner on a pulsed beam mainly depends on the phase at which the beam enters the conditioner and depends only slightly on the operating wavelength. In the nonlinear regime, however, the action of the conditioner strongly depends on the operating wavelength and only slightly upon the entrance phase. For a properly chosen operating wavelength, a little less than the electron`s relativistic cyclotron wavelength, the conditioner can decrease the axial velocity spread of a pulsed beam down to less than one-third of its initial value.

  17. Electron beam nanosculpting of Kirkendall oxide nanochannels.

    PubMed

    El Mel, Abdel-Aziz; Molina-Luna, Leopoldo; Buffière, Marie; Tessier, Pierre-Yves; Du, Ke; Choi, Chang-Hwan; Kleebe, Hans-Joachim; Konstantinidis, Stephanos; Bittencourt, Carla; Snyders, Rony

    2014-02-25

    The nanomanipulation of metal nanoparticles inside oxide nanotubes, synthesized by means of the Kirkendall effect, is demonstrated. In this strategy, a focused electron beam, extracted from a transmission electron microscope source, is used to site-selectively heat the oxide material in order to generate and steer a metal ion diffusion flux inside the nanochannels. The metal ion flux generated inside the tube is a consequence of the reduction of the oxide phase occurring upon exposure to the e-beam. We further show that the directional migration of the metal ions inside the nanotubes can be achieved by locally tuning the chemistry and the morphology of the channel at the nanoscale. This allows sculpting organized metal nanoparticles inside the nanotubes with various sizes, shapes, and periodicities. This nanomanipulation technique is very promising since it enables creating unique nanostructures that, at present, cannot be produced by an alternative classical synthesis route.

  18. Conditioner for a helically transported electron beam

    SciTech Connect

    Wang, C.

    1992-05-01

    The kinetic theory is developed to investigate a conditioner for a helically imported electron beam. Linear expressions for axial velocity spread are derived. Numerical simulation is used to check the theoretical results and examine nonlinear aspects of the conditioning process. The results show that in the linear regime the action of the beam conditioner on a pulsed beam mainly depends on the phase at which the beam enters the conditioner and depends only slightly on the operating wavelength. In the nonlinear regime, however, the action of the conditioner strongly depends on the operating wavelength and only slightly upon the entrance phase. For a properly chosen operating wavelength, a little less than the electron's relativistic cyclotron wavelength, the conditioner can decrease the axial velocity spread of a pulsed beam down to less than one-third of its initial value.

  19. Conditioner for a helically transported electron beam

    SciTech Connect

    Wang, C.

    1992-05-01

    The kinetic theory is developed to investigate a conditioner for a helically imported electron beam. Linear expressions for axial velocity spread are derived. Numerical simulation is used to check the theoretical results and examine nonlinear aspects of the conditioning process. The results show that in the linear regime the action of the beam conditioner on a pulsed beam mainly depends on the phase at which the beam enters the conditioner and depends only slightly on the operating wavelength. In the nonlinear regime, however, the action of the conditioner strongly depends on the operating wavelength and only slightly upon the entrance phase. For a properly chosen operating wavelength, a little less than the electron`s relativistic cyclotron wavelength, the conditioner can decrease the axial velocity spread of a pulsed beam down to less than one-third of its initial value.

  20. Electron Beam Technology for Environmental Pollution Control.

    PubMed

    Chmielewski, Andrzej G; Han, Bumsoo

    2016-10-01

    Worldwide, there are over 1700 electron beam (EB) units in commercial use, providing an estimated added value to numerous products, amounting to 100 billion USD or more. High-current electron accelerators are used in diverse industries to enhance the physical and chemical properties of materials and to reduce undesirable contaminants such as pathogens, toxic byproducts, or emissions. Over the past few decades, EB technologies have been developed aimed at ensuring the safety of gaseous and liquid effluents discharged to the environment. It has been demonstrated that EB technologies for flue gas treatment (SO x and NO x removal), wastewater purification, and sludge hygienization can be effectively deployed to mitigate environmental degradation. Recently, extensive work has been carried out on the use of EB for environmental remediation, which also includes the removal of emerging contaminants such as VOCs, endocrine disrupting chemicals (EDCs), and potential EDCs. PMID:27620188

  1. Focused electron beam in pyroelectric electron probe microanalyzer

    SciTech Connect

    Imashuku, Susumu; Imanishi, Akira; Kawai, Jun

    2013-07-15

    We report a method to focus the electron beam generated using a pyroelectric crystal. An electron beam with a spot size of 100 μm was achieved by applying an electrical field to an electroconductive needle tip set on a pyroelectric crystal. When the focused electron beam bombarded a sample, characteristic X-rays of the sample were only detected due to the production of an electric field between the needle tip and the sample.

  2. Disabling CNT Electronic Devices by Use of Electron Beams

    NASA Technical Reports Server (NTRS)

    Petkov, Mihail

    2008-01-01

    Bombardment with tightly focused electron beams has been suggested as a means of electrically disabling selected individual carbon-nanotubes (CNTs) in electronic devices. Evidence in support of the suggestion was obtained in an experiment in which a CNT field-effect transistor was disabled (see figure) by focusing a 1-keV electron beam on a CNT that served as the active channel of a field-effect transistor (FET). Such bombardment could be useful in the manufacture of nonvolatile-memory circuits containing CNT FETs. Ultimately, in order to obtain the best electronic performances in CNT FETs and other electronic devices, it will be necessary to fabricate the devices such that each one contains only a single CNT as an active element. At present, this is difficult because there is no way to grow a single CNT at a specific location and with a specific orientation. Instead, the common practice is to build CNTs into electronic devices by relying on spatial distribution to bridge contacts. This practice results in some devices containing no CNTs and some devices containing more than one CNT. Thus, CNT FETs have statistically distributed electronic characteristics (including switching voltages, gains, and mixtures of metallic and semiconducting CNTs). According to the suggestion, by using a 1-keV electron beam (e.g., a beam from a scanning electron microscope), a particular nanotube could be rendered electrically dysfunctional. This procedure could be repeated as many times as necessary on different CNTs in a device until all of the excess CNTs in the device had been disabled, leaving only one CNT as an active element (e.g., as FET channel). The physical mechanism through which a CNT becomes electrically disabled is not yet understood. On one hand, data in the literature show that electron kinetic energy >86 keV is needed to cause displacement damage in a CNT. On the other hand, inasmuch as a 1-keV beam focused on a small spot (typically a few tens of nanometers wide

  3. The electron-beam FGT process

    NASA Astrophysics Data System (ADS)

    Frank, Norman W.; Hirano, Shinichi

    The electron-beam process is one of the most effective methods of removing SO 2 and NO x from industrial flue gases. This flue gas treatment consists of adding a small amount of ammonia to the flue gas and irradiating the gas by means of an electron beam, thereby causing reactions which convert the SO 2 and NO x to ammonium sulfate and ammonium-sulfate nitrate. These salts may then be collected from the flue gas by means of such conventional collectors as an elecrtostatic precipitator or baghouse. This process has numerous advantages over currently-used conventional processes as follows: 1) The process simultaneously removes SO 2 and NO x from flue gas at high efficiency levels; 2) It is a dry process which is easily controlled and has excellent load-following capability; 3) Stock-gas reheat is not required; 4) The pollutants are converted into a salable agricultural fertilizer; 5) The process has low capital and operating cost requirements. Test results from the most recent pilot plant in Indianapolis, Indiana, will be discussed showing various characteristics of process control, temperature relationships, radiation dosage, pollution removals at various conditions, and by-product collection usage evaluations. The results will show what will be required in future commercial installations and what accelerator equipment will be required, including various configuration of irradiation zone process design. The economic evaluation will include studies of cost sensitivity and by-product pay back. Various designs for large scale plants indicate the process will have a place in the future clean-up of environmental pollutants.

  4. Electron beam initiated grafting of methacryloxypropyl-trimethoxysilane to fused silica glass

    NASA Astrophysics Data System (ADS)

    Shmykov, A. Yu.; Mjakin, S. V.; Vasiljeva, I. V.; Filippov, V. N.; Vylegzhanina, M. E.; Sukhanova, T. E.; Kurochkin, V. E.

    2009-04-01

    The effect of electron beam pretreatment of fused silica glass upon its surface functional composition and possibility for subsequent immobilization of methacryloxypropyl-trimethoxysilane (MOPTMS) layer is studied using FTIR spectroscopy and adsorption of acid-base indicators. The content of Brensted acidic centers (silanol groups) on the irradiated fused silica surface is found to follow an "oscillatory" trend as function of the absorbed dose below 100 kGy at electron beam processing due to the alternating reactions of hydroxylation (probably as a result of Si-O-Si bond disruption and interaction with radiolyzed physically adsorbed water) and thermal dehydration/dehydroxylation at radiation heating. The best conditions for MOPTMS layer formation are based on the increased acidity of both silica surface (formation of acidic hydroxyls) and the reaction medium (MOPTMS deposition from acetic acid solution). The optimal value of absorbed dose at electron beam processing providing the highest efficiency of MOPTMS grafting is 50 kGy at accelerated electron energy 700 keV. Electron beam pretreatment of fused silica surface is shown to provide more efficient MOPTMS immobilization in comparison with conventional chemical and thermal grafting procedures. The obtained results are promising for the enhancement of the processes for the production of fused silica glass capillaries for electrochromatography and electrophoresis at the stage of an intermediate bifunctional layer formation required for the subsequent deposition of specific polymer coatings.

  5. Study on electron beam in a low energy plasma focus

    SciTech Connect

    Khan, Muhammad Zubair; Ling, Yap Seong; San, Wong Chiow

    2014-03-05

    Electron beam emission was investigated in a low energy plasma focus device (2.2 kJ) using copper hollow anode. Faraday cup was used to estimate the energy of the electron beam. XR100CR X-ray spectrometer was used to explore the impact of the electron beam on the target observed from top-on and side-on position. Experiments were carried out at optimized pressure of argon gas. The impact of electron beam is exceptionally notable with two different approaches using lead target inside hollow anode in our plasma focus device.

  6. Effect of Electron Beam Irradiation on Tensile Strength of Polypropylene

    NASA Astrophysics Data System (ADS)

    Yamada, Hiroshi; Ikeda, Masayuki; Shimbo, Minoru; Miyano, Yasushi

    In this paper, the effects of the intensity of electron beam and the variation with time after irradiation of electron beam on the tensile strength of the polypropylene (PP), which is widely used as medicine containers, were investigated. PP with and without colorants were used first and samples irradiated under various intensity of EB. A tensile test on the irradiated samples with elapsed time after the irradiation of the electron beam was carried out. The effects of those factors on the tensile strength were discussed. The following results were obtained (1) The tensile strength of PP decreased due to the influence of the electron beam irradiation, however the rate of the decrease in strength was small compared with the original one. Furthermore, the rate of the decrease in strength was very small owing to the variation with time after the EB irradiation. (2) The tensile rupture strength of PP increased and the rupture strain owing to the influence of the electron beam irradiation compared with the original one. In addition, these rupture strength increased and the rupture strain decreased along with time after the irradiation of the electron beam. (3) The tensile rupture strain energy of PP decreased owing to the influence of the electron beam irradiation compared with the original one. In addition, the strain energy decreases with time after the irradiation of the electron beam. Moreover, the strength characteristics of PP with colorants received greater influence of electron beam compared with the one without colorants.

  7. Electron beam simulation from gun to collector: Towards a complete solution

    SciTech Connect

    Mertzig, R. Shornikov, A. Wenander, F.; Beebe, E.; Pikin, A.

    2015-01-09

    An electron-beam simulation technique for high-resolution complete EBIS/T modelling is presented. The technique was benchmarked on the high compression HEC{sup 2} test-stand with an electron beam current, current density and energy of 10 A, 10 kA/cm{sup 2} and 49.2 keV, and on the immersed electron beam at REXEBIS for electron beam characteristics of 0.4 A, 200 A/cm{sup 2} and 4.5 keV. In both Brillouin-like and immersed beams the electron-beam radius varies from several millimeters at the gun, through some hundreds of micrometers in the ionization region to a few centimeters at the collector over a total length of several meters. We report on our approach for finding optimal meshing parameters, based on the local beam properties such as magnetic field-strength, electron energy and beam radius. This approach combined with dividing the problem domain into sub-domains, and subsequent splicing of the local solutions allowed us to simulate the beam propagation in EBISes from the gun to the collector using a conventional PC in about 24–36 h. Brillouin-like electron beams propagated through the complete EBIS were used to analyze the beam behavior within the collector region. We checked whether elastically reflected paraxial electrons from a Brillouin-like beam will escape from the collector region and add to the loss current. We have also studied the power deposition profiles as function of applied potentials using two electrode geometries for a Brillouin-like beam including the effects of backscattered electrons.

  8. Crystallographic texture engineering through novel melt strategies via electron beam melting: Inconel 718

    SciTech Connect

    Dehoff, Ryan R.; Kirka, Michael M.; List, III, Frederick Alyious; Unocic, Kinga A.; Sames, William J.

    2014-01-01

    Preliminary research has demonstrated the ability to utilise novel scan strategies in the electron beam melting (EBM) process to establish control of crystallographic texture within Inconel 718 deposits. Conventional EBM scan strategies and process parameters yield coarse columnar grains aligned parallel to the build direction. Through varying process parameters such as beam power, beam velocity, beam focus and scan strategy, the behaviour of the electron beam can be manipulated from a line source to a point source. The net effect of these variations is that the resulting crystallographic texture is controlled in a manner to produce either epitaxial deposits or fully equiaxed deposits. Furthermore, this research demonstrates the ability to change the crystallographic texture on the macroscale indicating that EBM technology can be used to create complex geometric components with both site-specific microstructures and material properties.

  9. Crystallographic texture engineering through novel melt strategies via electron beam melting: Inconel 718

    DOE PAGESBeta

    Dehoff, Ryan R.; Kirka, Michael M.; List, III, Frederick Alyious; Unocic, Kinga A.; Sames, William J.

    2014-01-01

    Preliminary research has demonstrated the ability to utilise novel scan strategies in the electron beam melting (EBM) process to establish control of crystallographic texture within Inconel 718 deposits. Conventional EBM scan strategies and process parameters yield coarse columnar grains aligned parallel to the build direction. Through varying process parameters such as beam power, beam velocity, beam focus and scan strategy, the behaviour of the electron beam can be manipulated from a line source to a point source. The net effect of these variations is that the resulting crystallographic texture is controlled in a manner to produce either epitaxial deposits ormore » fully equiaxed deposits. Furthermore, this research demonstrates the ability to change the crystallographic texture on the macroscale indicating that EBM technology can be used to create complex geometric components with both site-specific microstructures and material properties.« less

  10. High energy electron beam joining of ceramic components

    SciTech Connect

    Turman, B.N.; Glass, S.J.; Halbleib, J.A.

    1997-07-01

    High strength, hermetic braze joints between ceramic components have been produced using high energy electron beams. With a penetration depth into a typical ceramic of {approximately}1 cm for a 10 MeV electron beam, this method provides the capability for rapid, transient brazing operations where temperature control of critical components is essential. The method deposits energy directly into a buried joint, allowing otherwise inaccessible interfaces to be brazed. Because of transient heating, higher thermal conductivity, lower heat capacity, and lower melting temperature of braze metals relative to the ceramic materials, a pulsed high power beam can melt a braze metal without producing excessive ceramic temperatures. We have demonstrated the feasibility of this process related to ceramic coupons as well as ceramic and glass tubes. The transient thermal response was predicted, using as input the energy absorption predicted from the coupled electron-photon transport analysis. The joining experiments were conducted with an RF Linac accelerator at 10-13 MV. The repetition rate of the pulsed beam was varied between 8 and 120 Hz, the average beam current was varied between 8 and 120 microamps, and the power was varied up to 1.5 kW. These beam parameters gave a beam power density between 0.2 to 2 kW/cm{sup 2}. The duration of the joining runs varied from 5 to 600 sec. Joining experiments have provided high strength between alumina - alumina and alumina - cermet joints in cylindrical geometry. These joints provided good hermetic seals. A series of tests was conducted to determine the minimum beam power and exposure time for producing, a hermetic seal.

  11. Electron beam diagnostic system using computed tomography and an annular sensor

    DOEpatents

    Elmer, John W.; Teruya, Alan T.

    2014-07-29

    A system for analyzing an electron beam including a circular electron beam diagnostic sensor adapted to receive the electron beam, the circular electron beam diagnostic sensor having a central axis; an annular sensor structure operatively connected to the circular electron beam diagnostic sensor, wherein the sensor structure receives the electron beam; a system for sweeping the electron beam radially outward from the central axis of the circular electron beam diagnostic sensor to the annular sensor structure wherein the electron beam is intercepted by the annular sensor structure; and a device for measuring the electron beam that is intercepted by the annular sensor structure.

  12. Electron beam diagnostic system using computed tomography and an annular sensor

    DOEpatents

    Elmer, John W.; Teruya, Alan T.

    2015-08-11

    A system for analyzing an electron beam including a circular electron beam diagnostic sensor adapted to receive the electron beam, the circular electron beam diagnostic sensor having a central axis; an annular sensor structure operatively connected to the circular electron beam diagnostic sensor, wherein the sensor structure receives the electron beam; a system for sweeping the electron beam radially outward from the central axis of the circular electron beam diagnostic sensor to the annular sensor structure wherein the electron beam is intercepted by the annular sensor structure; and a device for measuring the electron beam that is intercepted by the annular sensor structure.

  13. First test of BNL electron beam ion source with high current density electron beam

    SciTech Connect

    Pikin, Alexander Alessi, James G. Beebe, Edward N.; Shornikov, Andrey; Mertzig, Robert; Wenander, Fredrik; Scrivens, Richard

    2015-01-09

    A new electron gun with electrostatic compression has been installed at the Electron Beam Ion Source (EBIS) Test Stand at BNL. This is a collaborative effort by BNL and CERN teams with a common goal to study an EBIS with electron beam current up to 10 A, current density up to 10,000 A/cm{sup 2} and energy more than 50 keV. Intensive and pure beams of heavy highly charged ions with mass-to-charge ratio < 4.5 are requested by many heavy ion research facilities including NASA Space Radiation Laboratory (NSRL) at BNL and HIE-ISOLDE at CERN. With a multiampere electron gun, the EBIS should be capable of delivering highly charged ions for both RHIC facility applications at BNL and for ISOLDE experiments at CERN. Details of the electron gun simulations and design, and the Test EBIS electrostatic and magnetostatic structures with the new electron gun are presented. The experimental results of the electron beam transmission are given.

  14. Coherent Radiation from Relativistic Electron Beams.

    NASA Astrophysics Data System (ADS)

    Chen, Kuan-Ren

    Two new laser concepts, the Ion-Ripple Laser (IRL) and the Ion-Channel Laser (ICL), are proposed. A unified theory for coherent radiation from relativistic electron beams devices is developed; the theory not only links the physics of Cyclotron Masers (CMs) and Free Electron Lasers (FELs) but covers the physics of the IRLs and the ICLs. We have also invented a new numerical method, the Neo-Finite -Difference (NFD) method, for electromagnetic plasma simulations and applied it to studies of these lasers. The unified amplification theory compares the growth mechanisms. Two bunching mechanisms (both axial and azimuthal) exist, not only for the noncollective single electron resonance regime, but also in the collective gain regime. Competition or reinforcement between the two bunching mechanisms is determined by the q value (a parameter that determines how the electron oscillation frequency depends on energy), the electron axial velocity, and the wave phase velocity. The unified theory concludes that, for wave amplification, the sign of the electron mismatch frequency is required to be the same as the sign of a bunching parameter that is determined by the total bunching. In an IRL, a relativistic electron beam propagates obliquely through an ion ripple in a plasma. The radiation frequency depends on the beam energy, the ripple wave number, and the angle: omega ~ 2gamma ^{2}k_{ir}ccos theta. By proper choice of device parameters, sources of microwaves, optical, and perhaps even X-rays can be made. The dispersion relation for wave coupling is derived and used to calculate the radiation frequency and linear growth rate. The nonlinear saturation mechanism is explored. Computer simulation is used to verify the ideas, scaling laws and nonlinear mechanisms. In an ICL, the ion focusing force causes the electrons to oscillate about the channel axis and plays a similar role to the magnetic field in a CM. This electron motion is nonlinear and is studied. Simulations were performed

  15. Evolution and Control of 2219 Aluminum Microstructural Features through Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M.; Hafley, Robert A.; Domack, Marcia S.

    2006-01-01

    Electron beam freeform fabrication (EBF3) is a new layer-additive process that has been developed for near-net shape fabrication of complex structures. EBF3 uses an electron beam to create a molten pool on the surface of a substrate. Wire is fed into the molten pool and the part translated with respect to the beam to build up a 3-dimensional structure one layer at a time. Unlike many other freeform fabrication processes, the energy coupling of the electron beam is extremely well suited to processing of aluminum alloys. The layer-additive nature of the EBF3 process results in a tortuous thermal path producing complex microstructures including: small homogeneous equiaxed grains; dendritic growth contained within larger grains; and/or pervasive dendritic formation in the interpass regions of the deposits. Several process control variables contribute to the formation of these different microstructures, including translation speed, wire feed rate, beam current and accelerating voltage. In electron beam processing, higher accelerating voltages embed the energy deeper below the surface of the substrate. Two EBF3 systems have been established at NASA Langley, one with a low-voltage (10-30kV) and the other a high-voltage (30-60 kV) electron beam gun. Aluminum alloy 2219 was processed over a range of different variables to explore the design space and correlate the resultant microstructures with the processing parameters. This report is specifically exploring the impact of accelerating voltage. Of particular interest is correlating energy to the resultant material characteristics to determine the potential of achieving microstructural control through precise management of the heat flux and cooling rates during deposition.

  16. NOx reduction by electron beam-produced nitrogen atom injection

    DOEpatents

    Penetrante, Bernardino M.

    2002-01-01

    Deactivated atomic nitrogen generated by an electron beam from a gas stream containing more than 99% N.sub.2 is injected at low temperatures into an engine exhaust to reduce NOx emissions. High NOx reduction efficiency is achieved with compact electron beam devices without use of a catalyst.

  17. Electron Beam-Cure Polymer Matrix Composites: Processing and Properties

    NASA Technical Reports Server (NTRS)

    Wrenn, G.; Frame, B.; Jensen, B.; Nettles, A.

    2001-01-01

    Researchers from NASA and Oak Ridge National Laboratory are evaluating a series of electron beam curable composites for application in reusable launch vehicle airframe and propulsion systems. Objectives are to develop electron beam curable composites that are useful at cryogenic to elevated temperatures (-217 C to 200 C), validate key mechanical properties of these composites, and demonstrate cost-saving fabrication methods at the subcomponent level. Electron beam curing of polymer matrix composites is an enabling capability for production of aerospace structures in a non-autoclave process. Payoffs of this technology will be fabrication of composite structures at room temperature, reduced tooling cost and cure time, and improvements in component durability. This presentation covers the results of material property evaluations for electron beam-cured composites made with either unidirectional tape or woven fabric architectures. Resin systems have been evaluated for performance in ambient, cryogenic, and elevated temperature conditions. Results for electron beam composites and similar composites cured in conventional processes are reviewed for comparison. Fabrication demonstrations were also performed for electron beam-cured composite airframe and propulsion piping subcomponents. These parts have been built to validate manufacturing methods with electron beam composite materials, to evaluate electron beam curing processing parameters, and to demonstrate lightweight, low-cost tooling options.

  18. Electron beam inspection methods for imprint lithography at 32 nm

    NASA Astrophysics Data System (ADS)

    Selinidis, Kosta; Thompson, Ecron; Sreenivasan, S. V.; Resnick, Douglas J.

    2009-01-01

    Step and Flash Imprint Lithography redefines nanoimprinting. This novel technique involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed leaving a patterned solid on the substrate. Compatibility with existing CMOS processes requires a mask infrastructure in which resolution, inspection and repair are all addressed. The purpose of this paper is to understand the limitations of inspection at half pitches of 32 nm and below. A 32 nm programmed defect mask was fabricated. Patterns included in the mask consisted of an SRAM Metal 1 cell, dense lines, and dense arrays of pillars. Programmed defect sizes started at 4 nm and increased to 48 nm in increments of 4 nm. Defects in both the mask and imprinted wafers were characterized scanning electron microscopy and the measured defect areas were calculated. These defects were then inspected using a KLA-T eS35 electron beam wafer inspection system. Defect sizes as small as 12 nm were detected, and detection limits were found to be a function of defect type.

  19. Towards demonstration of electron cooling with bunched electron beam

    SciTech Connect

    Fedotov, A.

    2012-01-11

    All electron cooling systems which were in operation so far employed electron beam generated with an electrostatic electron gun in DC operating mode, immersed in a longitudinal magnetic field. At low energies magnetic field is also being used to transport electron beam through the cooling section from the gun to the collector. At higher energies (few MeV), it was shown that one can have simpler electron beam transport without continuous magnetic field. Because of a rather weak magnetic field on the cathode and in the cooling section the latter approach was referred to as 'non-magnetized cooling', since there was no suppression of the transverse angular spread of the electron beam with the magnetic field in the cooling section. Such a cooler successfully operated at FNAL (2005-11) at electron beam energy of 4.3 MeV. Providing cooling at even higher energies would be easier with RF acceleration of electron beam, and thus using bunched electron beam for cooling. Significant efforts were devoted to explore various aspects of such bunched electron beam cooling as part of R and D of high-energy electron cooling for RHIC. However, experimental studies of such cooling are still lacking. Establishing this technique experimentally would be extremely useful for future high-energy applications. Presently there is an ongoing effort to build Proof-of-Principle (PoP) experiment of Coherent Electron Cooling (CEC) at RHIC, which promises to be superior to conventional electron cooling for high energies. Since the CEC experiment is based on bunched electron beam and it has sections where electron beam co-propagates with the ion beam at the same velocity, it also provides a unique opportunity to explore experimentally conventional electron cooling but for the first time with a bunched electron beam. As a result, it allows us to explore techniques needed for the high-energy electron cooling such as 'painting' with a short electron beam and control of ion beam distribution under

  20. High power, electron-beam induced switching in diamond

    SciTech Connect

    Scarpetti, R.D.; Hofer, W.W.; Kania, D.R.; Schoenbach, K.H.; Joshi, R.P.; Molina, C.; Brinkmann, R.P.

    1993-07-01

    We are developing a high voltage, high average power, electron-beam controlled diamond switch that could significantly impact high power solid-state electronics in industrial and defense applications. An electron-beam controlled thin-film diamond could switch well over 100 kW average power at MHz frequencies, greater than 5 kV, and with high efficiency. This performance is due to the excellent thermal and electronic properties of diamond, the high efficiency achieved with electron beam control, and the demonstrated effectiveness of microchannel cooling. Our electron beam penetration depth measurements agree with our Monte-Carlo calculations. We have not observed electron beam damage in diamond for beam energies up to 150 keV. In this paper we describe our experimental and calculational results and research objectives.

  1. Etching with electron beam generated plasmas

    SciTech Connect

    Leonhardt, D.; Walton, S.G.; Muratore, C.; Fernsler, R.F.; Meger, R.A.

    2004-11-01

    A modulated electron beam generated plasma has been used to dry etch standard photoresist materials and silicon. Oxygen-argon mixtures were used to etch organic resist material and sulfur hexafluoride mixed with argon or oxygen was used for the silicon etching. Etch rates and anisotropy were determined with respect to gas compositions, incident ion energy (from an applied rf bias) and plasma duty factor. For 1818 negative resist and i-line resists the removal rate increased nearly linearly with ion energy (up to 220 nm/min at 100 eV), with reasonable anisotropic pattern transfer above 50 eV. Little change in etch rate was seen as gas composition went from pure oxygen to 70% argon, implying the resist removal mechanism in this system required the additional energy supplied by the ions. With silicon substrates at room temperature, mixtures of argon and sulfur hexafluoride etched approximately seven times faster (1375 nm/min) than mixtures of oxygen and sulfur hexafluoride ({approx}200 nm/min) with 200 eV ions, the difference is attributed to the passivation of the silicon by involatile silicon oxyfluoride (SiO{sub x}F{sub y}) compounds. At low incident ion energies, the Ar-SF{sub 6} mixtures showed a strong chemical (lateral) etch component before an ion-assisted regime, which started at {approx}75 eV. Etch rates were independent of the 0.5%-50% duty factors studied in this work.

  2. Fast magnetospheric echoes of energetic electron beams

    NASA Technical Reports Server (NTRS)

    Wilhelm, K.; Bernstein, W.; Kellogg, P. J.; Whalen, B. A.

    1985-01-01

    Electron beam experiments using rocketborne instrumentation have confirmed earlier observations of fast magnetospheric echoes of artificially injected energetic electrons. A total of 234 echoes have been observed in a pitch angle range from 9 to 110 deg at energies of 1.87 and 3.90 keV. Out of this number, 95 echoes could unambiguously be identified with known accelerator operations at 2-, 4-, or 8-keV energy and highest current levels resulting in the determination of transit times of typically 300 to 400 ms. In most cases, when echoes were present in both energy channels, the higher-energy electrons led the lower-energy ones by 50 to 70 ms. Adiabatic theory applied to these observations yields a reflection height of 3000 to 4000 km. An alternative interpretation is briefly examined, and its relative merit in describing the observations is evaluated. The injection process is discussed in some detail as the strong beam-plasma interaction that occurred near the electron accelerator appears to be instrumental in generating the source of heated electrons required for successful echo detection for both processes.

  3. Onorbit electron beam welding experiment definition

    NASA Technical Reports Server (NTRS)

    1989-01-01

    The proposed experiment design calls for six panels to be welded, each having unique characteristics selected to yield specific results and information. The experiment is completely automated and the concept necessitated the design of a new, miniaturized, self-contained electron beam (EB) welding system, for which purpose a separate IR and D was funded by the contractor, Martin Marietta Corporation. Since future tasks beyond the proposed experiment might call for astronauts to perform hand-held EB gun repairs or for the gun to be interfaced with a dexterous robot such as the planned flight telerobotic servicer (FTS), the EB gun is designed to be dismountable from the automated system. In the experiment design, two separate, identical sets of weld panels will be welded, one on earth in a vacuum chamber and the other onorbit in the aft cargo bay of an orbiter. Since the main objective of the experiment is to demonstrate that high quality welds can be achieved under onorbit conditions, the welds produced will be subjected to a wide range of discriminating non-destructive Q.C. procedures and destructive physical tests. However, advantage will be taken of the availability of a fairly large quantity of welded material in the two series of welded specimens to widen the circle of investigative talent by providing material to academic and scientific institutions for examination.

  4. Nonlinear wave scattering and electron beam relaxation

    NASA Technical Reports Server (NTRS)

    Muschietti, L.; Dum, C. T.

    1991-01-01

    The role played by nonlinear scattering during the relaxation of a warm electron beam is investigated through a numerical code based on kinetic equations. The code encompasses the quasi-linear wave-electron interaction and wave-wave scattering off ion clouds. Ions with velocities 2 nu sub i (nu sub i being the ion thermal velocity) are found to be the most efficient for scattering the Langmuir waves off their polarization clouds. The transfer rate of the spectrum out of resonance with the beam is larger by a factor 3 compared to usual estimates. The changes produced in the dispersion relation by the presence of the beam electrons dramatically alter the characteristics of the secondary spectrum. In a late phase the classic condensate K of about 0 is depleted, with the formation of a new condensate in resonance with the flat-topped beam distribution, which follows from the fact that the mere presence of the beam electrons creates a minimum in the frequency-wave-number relation. For strong and slow beams, the predictions of the code are found to be in excellent agreement with the results of the particle simulation if a dispersion relation that includes the beam is used.

  5. Electron beam cold hearth refining in Vallejo

    SciTech Connect

    Lowe, J.H.C.

    1994-12-31

    Electron Beam Cold Hearth Refining Furnace (EBCHR) in Vallejo, California is alive, well, and girding itself for developing new markets. A brief review of the twelve years experience with EBCHR in Vallejo. Acquisition of the Vallejo facility by Axel Johnson Metals, Inc. paves the way for the development of new products and markets. A discussion of some of the new opportunities for the advancement of EBCHR technology. Discussed are advantages to the EBCHR process which include: extended surface area of molten metal exposed to higher vacuum; liberation of insoluble oxide particles to the surface of the melt; higher temperatures that allowed coarse solid particles like carbides and carbonitrides to be suspended in the fluid metal as fine micro-segregates, and enhanced removal of volatile trace impurities like lead, bismuth and cadmium. Future work for the company includes the continued recycling of alloys and also fabricating stainless steel for the piping of chip assembly plants. This is to prevent `killer defects` that ruin a memory chip.

  6. Heat shrinkage of electron beam modified EVA

    NASA Astrophysics Data System (ADS)

    Datta, Sujit K.; Chaki, T. K.; Tikku, V. K.; Pradhan, N. K.; Bhowmick, A. K.

    1997-10-01

    Heat shrinkage of electron beam modified ethylene vinyl acetate copolymer (EVA) has been investigated over a range of times, temperatures, stretching, irradiation doses and trimethylolpropane trimethacrylate (TMPTMA) levels. The irradiated (radiation dose 50 kGy and TMPTMA level 1%) and stretched (100% elongation) sample shrinks to a maximum level when kept at 453K temperature for 60 s. The heat shrinkage of samples irradiated with radiation doses of 20, 50, 100 and 150 kGy increases sharply with increasing stretching in the initial stage. Amnesia rating decreases with increasing radiation dose and TMPTMA level as well as gel content. The high radiation dose and TMPTMA level lower the heat shrinkage due to the chain scission. The effect of temperature at which extension is carried out on heat shrinkage is marginal. The irradiated (radiation dose 50 kGy and TMPTMA level 1%) EVA tubes of different dimensions expanded in a laboratory grade tube expander show similar behaviour at 453K and 60 s. The X-ray and DSC studies reveal that the crystallinity increases on stretching due to orientation of chains and it decreases to a considerable extent on heat shrinking. The theoretical and experimental values of heat shrinkage for tubes and rectangular strips are in good accord, when the radiation dose is 50 kGy and TMPTMA level 1%.

  7. Electron beam damage in oxides: a review

    NASA Astrophysics Data System (ADS)

    Jiang, Nan

    2016-01-01

    This review summarizes a variety of beam damage phenomena relating to oxides in (scanning) transmission electron microscopes, and underlines the shortcomings of currently popular mechanisms. These phenomena include mass loss, valence state reduction, phase decomposition, precipitation, gas bubble formation, phase transformation, amorphization and crystallization. Moreover, beam damage is also dependent on specimen thickness, specimen orientation, beam voltage, beam current density and beam size. This article incorporates all of these damage phenomena and experimental dependences into a general description, interpreted by a unified mechanism of damage by induced electric field. The induced electric field is produced by positive charges, which are generated from excitation and ionization. The distribution of the induced electric fields inside a specimen is beam-illumination- and specimen-shape- dependent, and associated with the experimental dependence of beam damage. Broadly speaking, the mechanism operates differently in two types of material. In type I, damage increases the resistivity of the irradiated materials, and is thus divergent, resulting in phase separation. In type II, damage reduces the resistivity of the irradiated materials, and is thus convergent, resulting in phase transformation. Damage by this mechanism is dependent on electron-beam current density. The two experimental thresholds are current density and irradiation time. The mechanism comes into effect when these thresholds are exceeded, below which the conventional mechanisms of knock-on and radiolysis still dominate.

  8. Electron beam damage in oxides: a review.

    PubMed

    Jiang, Nan

    2016-01-01

    This review summarizes a variety of beam damage phenomena relating to oxides in (scanning) transmission electron microscopes, and underlines the shortcomings of currently popular mechanisms. These phenomena include mass loss, valence state reduction, phase decomposition, precipitation, gas bubble formation, phase transformation, amorphization and crystallization. Moreover, beam damage is also dependent on specimen thickness, specimen orientation, beam voltage, beam current density and beam size. This article incorporates all of these damage phenomena and experimental dependences into a general description, interpreted by a unified mechanism of damage by induced electric field. The induced electric field is produced by positive charges, which are generated from excitation and ionization. The distribution of the induced electric fields inside a specimen is beam-illumination- and specimen-shape- dependent, and associated with the experimental dependence of beam damage. Broadly speaking, the mechanism operates differently in two types of material. In type I, damage increases the resistivity of the irradiated materials, and is thus divergent, resulting in phase separation. In type II, damage reduces the resistivity of the irradiated materials, and is thus convergent, resulting in phase transformation. Damage by this mechanism is dependent on electron-beam current density. The two experimental thresholds are current density and irradiation time. The mechanism comes into effect when these thresholds are exceeded, below which the conventional mechanisms of knock-on and radiolysis still dominate.

  9. Device and method for relativistic electron beam heating of a high-density plasma to drive fast liners

    DOEpatents

    Thode, Lester E.

    1981-01-01

    A device and method for relativistic electron beam heating of a high-density plasma in a small localized region. A relativistic electron beam generator or accelerator produces a high-voltage electron beam which propagates along a vacuum drift tube and is modulated to initiate electron bunching within the beam. The beam is then directed through a low-density gas chamber which provides isolation between the vacuum modulator and the relativistic electron beam target. The relativistic beam is then applied to a high-density target plasma which typically comprises DT, DD, hydrogen boron or similar thermonuclear gas at a density of 10.sup.17 to 10.sup.20 electrons per cubic centimeter. The target gas is ionized prior to application of the electron beam by means of a laser or other preionization source to form a plasma. Utilizing a relativistic electron beam with an individual particle energy exceeding 3 MeV, classical scattering by relativistic electrons passing through isolation foils is negligible. As a result, relativistic streaming instabilities are initiated within the high-density target plasma causing the relativistic electron beam to efficiently deposit its energy and momentum into a small localized region of the high-density plasma target. Fast liners disposed in the high-density target plasma are explosively or ablatively driven to implosion by a heated annular plasma surrounding the fast liner which is generated by an annular relativistic electron beam. An azimuthal magnetic field produced by axial current flow in the annular plasma, causes the energy in the heated annular plasma to converge on the fast liner.

  10. Flexible cadmium telluride thin films grown on electron-beam-irradiated graphene/thin glass substrates

    SciTech Connect

    Seo, Won-Oh; Kim, Jihyun; Koo, Yong Hwan; Kim, Byungnam; Lee, Byung Cheol; Kim, Donghwan

    2014-08-25

    We demonstrate the close-spaced sublimation growth of polycrystalline cadmium telluride (CdTe) thin films on a flexible graphene electrode/thin glass substrate structure. Prior to the growth of CdTe films, chemical-vapor-deposited graphene was transferred onto a flexible glass substrate and subjected to electron-beam irradiation at an energy of 0.2 MeV in order to intentionally introduce the defects into it in a controlled manner. Micro-Raman spectroscopy and sheet resistance measurements were employed to monitor the damage and disorder in the electron-beam irradiated graphene layers. The morphology and optical properties of the CdTe thin films deposited on a graphene/flexible glass substrate were systematically characterized. The integration of the defective graphene layers with a flexible glass substrate can be a useful platform to grow various thin-film structures for flexible electronic and optoelectronic devices.

  11. Modeling of vapor transport of electron beam evaporation based coating system

    NASA Astrophysics Data System (ADS)

    Maiti, Namita; Tak, Atul; Khabade, Yashodhan; Suryawanshi, V. B.; Das, A. K.

    2012-06-01

    The modeling of vapor transport of an electron beam evaporation based coating system has been carried out in this work. Computational fluid dynamics (CFD) modeling has been tailored to analyze the evaporation and deposition of titanium material. Based on the physical model, the model relates the output power of the electron gun and the temperature profile on the evaporant surface. The simulated vapor distribution helps in predicting the coating thickness. The experimental results presented here agree with the simulation results.

  12. Structural and optical properties of electron beam evaporated yttria stabilized zirconia thin films

    SciTech Connect

    Kirubaharan, A. Kamalan; Kuppusami, P. Dharini, T.; Ramachandran, D.; Singh, Akash; Mohandas, E.

    2015-06-24

    Yttria stabilized zirconia (10 mole % Y{sub 2}O{sub 3}) thin films were deposited on quartz substrates using electron beam physical vapor deposition at the substrate temperatures in the range 300 – 973 K. XRD analysis showed cubic crystalline phase of YSZ films with preferred orientation along (111). The surface roughness was found to increase with the increase of deposition temperatures. The optical band gap of ∼5.7 eV was calculated from transmittance curves. The variation in the optical properties is correlated with the changes in the microstructural features of the films prepared as a function of substrate temperature.

  13. COMPONENTS OF LASER SYSTEMS: Pumping of the GARPUN wide-aperture excimer laser by counterpropagating electron beams

    NASA Astrophysics Data System (ADS)

    Arlantsev, S. V.; Grigor'yants, E. A.; Vadkovskii, A. D.; Zvorykin, V. D.; Metreveli, G. E.

    1994-03-01

    The transport of high-current electron beams from vacuum diodes to the laser chamber of the GARPUN wide-aperture excimer laser was investigated experimentally and theoretically. The processes involving the transport of fast electrons in argon and krypton in a longitudinal magnetic field were also studied. Pumping by counter-propagating electron beams resulted in the deposition of up to 2.1 kJ of energy into the active medium of the laser, which corresponded to a specific excitation power of ~0.8 MW cm-3 with an inhomogeneity of less than 20% over a 12 cm × 18 cm aperture. The efficiency of the energy deposition by electron beams was ~60% and the overall efficiency of the laser pumping system was ~16%.

  14. Electron Beam Freeform Fabrication in the Space Environment

    NASA Technical Reports Server (NTRS)

    Hafley, Robert A.; Taminger, Karen M. B.; Bird, R. Keith

    2007-01-01

    The influence of reduced gravitational forces (in space and on the lunar or Martian surfaces) on manufacturing processes must be understood for effective fabrication and repair of structures and replacement parts during long duration space missions. The electron beam freeform fabrication (EBF3) process uses an electron beam and wire to fabricate metallic structures. The process efficiencies of the electron beam and the solid wire feedstock make the EBF3 process attractive for use in-space. This paper will describe the suitability of the EBF3 process in the space environment and will highlight preliminary testing of the EBF3 process in a zero-gravity environment.

  15. Feasibility study for mega-electron-volt electron beam tomography

    SciTech Connect

    Hampel, U.; Baertling, Y.; Hoppe, D.; Kuksanov, N.; Fadeev, S.; Salimov, R.

    2012-09-15

    Electron beam tomography is a promising imaging modality for the study of fast technical processes. But for many technical objects of interest x rays of several hundreds of keV energy are required to achieve sufficient material penetration. In this article we report on a feasibility study for fast electron beam computed tomography with a 1 MeV electron beam. The experimental setup comprises an electrostatic accelerator with beam optics, transmission target, and a single x-ray detector. We employed an inverse fan-beam tomography approach with radiographic projections being generated from the linearly moving x-ray source. Angular projections were obtained by rotating the object.

  16. Experimental observation of helical microbunching of a relativistic electron beam

    SciTech Connect

    Hemsing, E.; Knyazik, A.; O'Shea, F.; Marinelli, A.; Musumeci, P.; Williams, O.; Rosenzweig, J. B.; Tochitsky, S.

    2012-02-27

    Experimental observation of the microbunching of a relativistic electron beam at the second harmonic interaction frequency of a helical undulator is presented. The microbunching signal is observed from the coherent transition radiation of the electron beam and indicates experimental evidence of a dominantly helical electron beam density distribution. This result is in agreement with theoretical and numerical predictions and provides a proof-of-principle demonstration of proposed schemes designed to generate light with orbital angular momentum in high-gain free-electron lasers.

  17. Quantum effects in electron beam pumped GaAs

    SciTech Connect

    Yahia, M. E.; Azzouz, I. M.; Moslem, W. M.

    2013-08-19

    Propagation of waves in nano-sized GaAs semiconductor induced by electron beam are investigated. A dispersion relation is derived by using quantum hydrodynamics equations including the electrons and holes quantum recoil effects, exchange-correlation potentials, and degenerate pressures. It is found that the propagating modes are instable and strongly depend on the electron beam parameters, as well as the quantum recoil effects and degenerate pressures. The instability region shrinks with the increase of the semiconductor number density. The instability arises because of the energetic electron beam produces electron-hole pairs, which do not keep in phase with the electrostatic potential arising from the pair plasma.

  18. Feasibility study for mega-electron-volt electron beam tomography.

    PubMed

    Hampel, U; Bärtling, Y; Hoppe, D; Kuksanov, N; Fadeev, S; Salimov, R

    2012-09-01

    Electron beam tomography is a promising imaging modality for the study of fast technical processes. But for many technical objects of interest x rays of several hundreds of keV energy are required to achieve sufficient material penetration. In this article we report on a feasibility study for fast electron beam computed tomography with a 1 MeV electron beam. The experimental setup comprises an electrostatic accelerator with beam optics, transmission target, and a single x-ray detector. We employed an inverse fan-beam tomography approach with radiographic projections being generated from the linearly moving x-ray source. Angular projections were obtained by rotating the object.

  19. Pulsed electron beam propagation in argon and nitrogen gas mixture

    NASA Astrophysics Data System (ADS)

    Kholodnaya, G. E.; Sazonov, R. V.; Ponomarev, D. V.; Remnev, G. E.; Zhirkov, I. S.

    2015-10-01

    The paper presents the results of current measurements for the electron beam, propagating inside a drift tube filled in with a gas mixture (Ar and N2). The experiments were performed using the TEA-500 pulsed electron accelerator. The main characteristics of electron beam were as follows: 60 ns pulse duration, up to 200 J energy, and 5 cm diameter. The electron beam propagated inside the drift tube assembled of three sections. Gas pressures inside the drift tube were 760 ± 3, 300 ± 3, and 50 ± 1 Torr. The studies were performed in argon, nitrogen, and their mixtures of 33%, 50%, and 66% volume concentrations, respectively.

  20. Faraday cup characterization of electron beam welding parameters

    SciTech Connect

    Burgardt, P.; Knaus, S.E.; Kautz, D.D.

    1987-10-12

    The use of the electron beam welding process to produce precision welds on many materials has been well documented in the literature. Some joint configurations may need more parameter control than is typically afforded by the standard electron beam welding machine. The repeatability and transferability of the electron beam welding parameters must also be regarded during weld development on many designs. Types of instrumentation which enhance the parameter control should be developed to higher levels. This instrumentation is important to the accurate transfer of technology between welding machines and production cycles. 7 refs., 6 figs., 1 tab.

  1. Dissociation phenomena in electron-beam sustained carbon dioxide lasers

    NASA Technical Reports Server (NTRS)

    Harris, Michael R.; Willetts, David V.

    1990-01-01

    A number of applications are emerging requiring efficient, long pulse, long-life sealed CO2 lasers. Examples include the proposed NASA and ESA wind lidars. Electron-beam sustained discharge devices are strong contenders. Unlike self-sustained discharges, e-beam sustenance readily provides efficient performance from large volume discharges and offers pulse lengths well in excess of the microsecond or so generally associated with self-sustained devices. In the case of the e-beam sustained laser, since the plasma is externally maintained and operated at electric field strengths less than that associated with the glow to arc transition, the discharges can be run even in the presence of strongly attacking species such as O2. Build up of large levels of attacking contaminants is nevertheless undesirable as their presence reduces the current drawn by the plasma and thus the pumping rate to the upper laser level. The impedance rise leads to a mismatch of the pulse forming network with a consequent loss of control over energy deposition, operating E/N, and gain. Clearly CO2 dissociation rates, the influence of dissociation products on the discharge and gain, and tolerance of the discharge to these products need to be determined. This information can then be used to assess co-oxidation catalyst requirements for sealed operation.

  2. Finite Element Models for Electron Beam Freeform Fabrication Process

    NASA Technical Reports Server (NTRS)

    Chandra, Umesh

    2012-01-01

    Electron beam freeform fabrication (EBF3) is a member of an emerging class of direct manufacturing processes known as solid freeform fabrication (SFF); another member of the class is the laser deposition process. Successful application of the EBF3 process requires precise control of a number of process parameters such as the EB power, speed, and metal feed rate in order to ensure thermal management; good fusion between the substrate and the first layer and between successive layers; minimize part distortion and residual stresses; and control the microstructure of the finished product. This is the only effort thus far that has addressed computer simulation of the EBF3 process. The models developed in this effort can assist in reducing the number of trials in the laboratory or on the shop floor while making high-quality parts. With some modifications, their use can be further extended to the simulation of laser, TIG (tungsten inert gas), and other deposition processes. A solid mechanics-based finite element code, ABAQUS, was chosen as the primary engine in developing these models whereas a computational fluid dynamics (CFD) code, Fluent, was used in a support role. Several innovative concepts were developed, some of which are highlighted below. These concepts were implemented in a number of new computer models either in the form of stand-alone programs or as user subroutines for ABAQUS and Fluent codes. A database of thermo-physical, mechanical, fluid, and metallurgical properties of stainless steel 304 was developed. Computing models for Gaussian and raster modes of the electron beam heat input were developed. Also, new schemes were devised to account for the heat sink effect during the deposition process. These innovations, and others, lead to improved models for thermal management and prediction of transient/residual stresses and distortions. Two approaches for the prediction of microstructure were pursued. The first was an empirical approach involving the

  3. Effect of Orientation on Tensile Properties of Inconel 718 Block Fabricated with Electron Beam Freeform Fabrication (EBF3)

    NASA Technical Reports Server (NTRS)

    Bird, R. Keith; Atherton, Todd S.

    2010-01-01

    Electron beam freeform fabrication (EBF3) direct metal deposition processing was used to fabricate an Inconel 718 bulk block deposit. Room temperature tensile properties were measured as a function of orientation and location within the block build. This study is a follow-on activity to previous work on Inconel 718 EBF3 deposits that were too narrow to allow properties to be measured in more than one orientation

  4. Pt/Ceria-based Catalysts for Small Alcohol Electrooxidation

    NASA Astrophysics Data System (ADS)

    Menendez-Mora, Christian L.

    High emissions of fossil-based energy sources have led to scientists around the world to develop new alternatives for the future. In this sense, fuel cells are a remarkable and promising energy option with less environmental impact. The most used fuels for this technology are hydrogen and small chain alcohols, which can be oxidized to transform their chemical energy into electrical power. To do this, fuel cells need catalysts that will act as an active surface where the oxidation can take place. The problem with platinum catalysts is its possible CO poisoning with intermediates that are produced before the complete oxidation of alcohol to CO2. Different approaches have been taken to try to resolve this issue. In this case, cerium oxide (ceria) was selected as a co-catalyst to mitigate the effect of CO poisoning of platinum. Ceria is a compound that has the ability to work as an "oxygen tank" and can donate oxygen to carbon monoxide that is strongly adsorbed at platinum surface to produce CO2 (carbon dioxide), regenerating the Pt surface for further alcohol oxidation. Therefore, enhancing the current density as well as the power output of a fuel cell. First, an occlusion deposition technique was used to prepare platinum/ceria composite electrodes and tested them towards small chain alcohol oxidation such as methanol oxidation reaction in acidic and alkaline media. The preliminary results demonstrated that the Pt/ceria electrodes were more efficient towards methanol electrooxidation when compared to Pt electrodes. This enhancement was attributed to the presence of ceria. A second preparation method was selected for the synthesis of ceria/Pt catalysts. In this case, a hydrothermal method was used and the catalysis were studied for the effect of MeOH, EtOH and n-BuOH oxidation. The observed effect was that electrodes made of Pt/Pt:CeO2-x showed better catalytic effect than Pt/ceria and platinum electrodes. Moreover, a comparison between ceria nanorods versus

  5. Electron beam chemistry produces high purity metals

    NASA Technical Reports Server (NTRS)

    Philipp, W. H.; May, C. E.; Marsik, S. J.; Lad, R. A.

    1972-01-01

    Application of radiation chemistry for deposition of metals by irradiation of aqueous solutions with high energy electrons is presented. Design of reaction vessel for irradiation of solution is illustrated. Features of radiochemical technique and procedures followed are described.

  6. Stimulated electromagnetic interactions in spatiotemporally gyrating relativistic electron beams

    SciTech Connect

    Davies, J.A.; Chen, C.

    1999-07-01

    One possible method to significantly widen the band-widths of present gyroklystron amplifiers is to utilize extended interaction structures in the input sections, the buncher sections and the output sections, in conjunction with stagger tuning. Through extended interactions, however, electron beams can undergo stimulated electromagnetic interactions, causing multimode excitations. In this paper, the authors investigate stimulated electromagnetic interactions in relativistic electron beams gyrating in an externally applied uniform magnetic field. The electron gyrophases are assumed to have strong spatiotemporal correlations. By applying Vlassor-Maxwell equations together with Lorentz transformations, they obtain the general dispersion relation for electromagnetic and electrostatic wave perturbations on the electron beam for this system. The dispersion relation is used to analyze a variety of stimulated electromagnetic interactions on such electron beams. Results of these analyses are discussed.

  7. Electron beam irradiated silver nanowires for a highly transparent heater

    PubMed Central

    Hong, Chan-Hwa; Oh, Seung Kyu; Kim, Tae Kyoung; Cha, Yu-Jung; Kwak, Joon Seop; Shin, Jae-Heon; Ju, Byeong-Kwon; Cheong, Woo-Seok

    2015-01-01

    Transparent heaters have attracted increasing attention for their usefulness in vehicle windows, outdoor displays, and periscopes. We present high performance transparent heaters based on Ag nanowires with electron beam irradiation. We obtained an Ag-nanowire thin film with 48 ohm/sq of sheet resistance and 88.8% (substrate included) transmittance at 550 nm after electron beam irradiation for 120 sec. We demonstrate that the electron beam creates nano-soldering at the junctions of the Ag nanowires, which produces lower sheet resistance and improved adhesion of the Ag nanowires. We fabricated a transparent heater with Ag nanowires after electron beam irradiation, and obtained a temperature of 51 °C within 1 min at an applied voltage of 7 V. The presented technique will be useful in a wide range of applications for transparent heaters. PMID:26639760

  8. UV laser ionization and electron beam diagnostics for plasma lenses

    SciTech Connect

    Govil, R.; Volfbeyn, P.; Leemans, W.

    1995-04-01

    A comprehensive study of focusing of relativistic electron beams with overdense and underdense plasma lenses requires careful control of plasma density and scale lengths. Plasma lens experiments are planned at the Beam Test Facility of the LBL Center for Beam Physics, using the 50 MeV electron beam delivered by the linac injector from the Advanced Light Source. Here we present results from an interferometric study of plasmas produced in tri-propylamine vapor with a frequency quadrupled Nd:YAG laser at 266 nm. To study temporal dynamics of plasma lenses we have developed an electron beam diagnostic using optical transition radiation to time resolve beam size and divergence. Electron beam ionization of the plasma has also been investigated.

  9. Electron beam irradiated silver nanowires for a highly transparent heater

    NASA Astrophysics Data System (ADS)

    Hong, Chan-Hwa; Oh, Seung Kyu; Kim, Tae Kyoung; Cha, Yu-Jung; Kwak, Joon Seop; Shin, Jae-Heon; Ju, Byeong-Kwon; Cheong, Woo-Seok

    2015-12-01

    Transparent heaters have attracted increasing attention for their usefulness in vehicle windows, outdoor displays, and periscopes. We present high performance transparent heaters based on Ag nanowires with electron beam irradiation. We obtained an Ag-nanowire thin film with 48 ohm/sq of sheet resistance and 88.8% (substrate included) transmittance at 550 nm after electron beam irradiation for 120 sec. We demonstrate that the electron beam creates nano-soldering at the junctions of the Ag nanowires, which produces lower sheet resistance and improved adhesion of the Ag nanowires. We fabricated a transparent heater with Ag nanowires after electron beam irradiation, and obtained a temperature of 51 °C within 1 min at an applied voltage of 7 V. The presented technique will be useful in a wide range of applications for transparent heaters.

  10. Brushless dc motor uses electron beam switching tube as commutator

    NASA Technical Reports Server (NTRS)

    Studer, P.

    1965-01-01

    Electron beam switching tube eliminates physical contact between rotor and stator in brushless dc motor. The tube and associated circuitry control the output of a dc source to sequentially energize the motor stator windings.

  11. Inductive voltage adder (IVA) for submillimeter radius electron beam

    SciTech Connect

    Mazarakis, M.G.; Poukey, J.W.; Maenchen, J.E.

    1996-12-31

    The authors have already demonstrated the utility of inductive voltage adder accelerators for production of small-size electron beams. In this approach, the inductive voltage adder drives a magnetically immersed foilless diode to produce high-energy (10--20 MeV), high-brightness pencil electron beams. This concept was first demonstrated with the successful experiments which converted the linear induction accelerator RADLAC II into an IVA fitted with a small 1-cm radius cathode magnetically immersed foilless diode (RADLAC II/SMILE). They present here first validations of extending this idea to mm-scale electron beams using the SABRE and HERMES-III inductive voltage adders as test beds. The SABRE experiments are already completed and have produced 30-kA, 9-MeV electron beams with envelope diameter of 1.5-mm FWHM. The HERMES-III experiments are currently underway.

  12. Reduction of oxide microtrenching by electron beam assisted etching

    NASA Astrophysics Data System (ADS)

    Watanabe, M.; Shaw, D. M.; Collins, G. J.

    2000-10-01

    High density plasma etching of submicron wide oxide trenches often results in non-ideal etched features. For example, microtrenching is the result of higher etch rate near the side wall as compared to the center of the trench. Herein, we apply a previously reported[1] high energy (100 - 900 eV) electron beam directed at the etching wafer surface to reduce microtrenching during the etching of 0.5 micron wide silicon dioxide (SiO2) trench patterns in an inductively coupled fluorocarbon plasma. The directed electron beam neutralizes the positive charge buildup at the bottom of the trench and reduces the microtrench formation. Scanning Electron Microscopy (SEM) images of features etched with and without the electron beam show that the electron beam is effective in reducing microtrenching. [1] D. M. Shaw, M. Watanabe, G. J. Collins, and H. Sugai, Jpn. J. Appl. Phys. 38, 87 (1999).

  13. Electron beam directed energy device and methods of using same

    DOEpatents

    Retsky, Michael W.

    2007-10-16

    A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

  14. Electron beam seals outer surfaces of porous bodies

    NASA Technical Reports Server (NTRS)

    Herz, W. H.; Kurtz, A. D.; Kurtz, R. A.

    1966-01-01

    Porous tungsten plugs provide even airflow for frictionless bearings used in air bearing supported gyros. The plugs have their outer cylindrical surface sealed by an electron beam process to ensure unidirectional airflow through their exit ends.

  15. UNDULATOR-BASED LASER WAKEFIELD ACCELERATOR ELECTRON BEAM DIAGNOSTIC

    SciTech Connect

    Bakeman, M.S.; Fawley, W.M.; Leemans, W. P.; Nakamura, K.; Robinson, K.E.; Schroeder, C.B.; Toth, C.

    2009-05-04

    to couple the THUNDER undulator to the LOASIS Lawrence Berkeley National Laboratory (LBNL) laser wakefield accelerator (LWFA). Currently the LWFA has achieved quasi-monoenergetic electron beams with energies up to 1 GeV. These ultra-short, high-peak-current, electron beams are ideal for driving a compact XUV free electron laser (FEL). Understanding the electron beam properties such as the energy spread and emittance is critical for achieving high quality light sources with high brightness. By using an insertion device such as an undulator and observing changes in the spontaneous emission spectrum, the electron beam energy spread and emittance can be measured with high precision. The initial experiments will use spontaneous emission from 1.5 m of undulator. Later experiments will use up to 5 m of undulator with a goal of a high gain, XUV FEL.

  16. In-process thermal imaging of the electron beam freeform fabrication process

    NASA Astrophysics Data System (ADS)

    Taminger, Karen M.; Domack, Christopher S.; Zalameda, Joseph N.; Taminger, Brian L.; Hafley, Robert A.; Burke, Eric R.

    2016-05-01

    Researchers at NASA Langley Research Center have been developing the Electron Beam Freeform Fabrication (EBF3) metal additive manufacturing process for the past 15 years. In this process, an electron beam is used as a heat source to create a small molten pool on a substrate into which wire is fed. The electron beam and wire feed assembly are translated with respect to the substrate to follow a predetermined tool path. This process is repeated in a layer-wise fashion to fabricate metal structural components. In-process imaging has been integrated into the EBF3 system using a near-infrared (NIR) camera. The images are processed to provide thermal and spatial measurements that have been incorporated into a closed-loop control system to maintain consistent thermal conditions throughout the build. Other information in the thermal images is being used to assess quality in real time by detecting flaws in prior layers of the deposit. NIR camera incorporation into the system has improved the consistency of the deposited material and provides the potential for real-time flaw detection which, ultimately, could lead to the manufacture of better, more reliable components using this additive manufacturing process.

  17. Evolution and Control of 2219 Aluminum Microstructural Features Through Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M.; Hafley, Robert A.; Domack, Marcia S.

    2006-01-01

    The layer-additive nature of the electron beam freeform fabrication (EBF3) process results in a tortuous thermal path producing complex microstructures including: small homogeneous equiaxed grains; dendritic growth contained within larger grains; and/or pervasive dendritic formation in the interpass regions of the deposits. Several process control variables contribute to the formation of these different microstructures, including translation speed, wire feed rate, beam current and accelerating voltage. In electron beam processing, higher accelerating voltages embed the energy deeper below the surface of the substrate. Two EBF3 systems have been established at NASA Langley, one with a low-voltage (10-30kV) and the other a high-voltage (30-60 kV) electron beam gun. Aluminum alloy 2219 was processed over a range of different variables to explore the design space and correlate the resultant microstructures with the processing parameters. This report is specifically exploring the impact of accelerating voltage. Of particular interest is correlating energy to the resultant material characteristics to determine the potential of achieving microstructural control through precise management of the heat flux and cooling rates during deposition.

  18. Characterization of Electron Beam Free-Form Fabricated 2219 Aluminum and 316 Stainless Steel

    NASA Technical Reports Server (NTRS)

    Ekrami, Yasamin; Forth, Scott C.; Waid, Michael C.

    2011-01-01

    Researchers at NASA Langley Research Center have developed an additive manufacturing technology for ground and future space based applications. The electron beam free form fabrication (EBF3) is a rapid metal fabrication process that utilizes an electron beam gun in a vacuum environment to replicate a CAD drawing of a part. The electron beam gun creates a molten pool on a metal substrate, and translates with respect to the substrate to deposit metal in designated regions through a layer additive process. Prior to demonstration and certification of a final EBF3 part for space flight, it is imperative to conduct a series of materials validation and verification tests on the ground in order to evaluate mechanical and microstructural properties of the EBF3 manufactured parts. Part geometries of EBF3 2219 aluminum and 316 stainless steel specimens were metallographically inspected, and tested for strength, fatigue crack growth, and fracture toughness. Upon comparing the results to conventionally welded material, 2219 aluminum in the as fabricated condition demonstrated a 30% and 16% decrease in fracture toughness and ductility, respectively. The strength properties of the 316 stainless steel material in the as deposited condition were comparable to annealed stainless steel alloys. Future fatigue crack growth tests will integrate various stress ranges and maximum to minimum stress ratios needed to fully characterize EBF3 manufactured specimens.

  19. In-Process Thermal Imaging of the Electron Beam Freeform Fabrication Process

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M.; Domack, Christopher S.; Zalameda, Joseph N.; Taminger, Brian L.; Hafley, Robert A.; Burke, Eric R.

    2016-01-01

    Researchers at NASA Langley Research Center have been developing the Electron Beam Freeform Fabrication (EBF3) metal additive manufacturing process for the past 15 years. In this process, an electron beam is used as a heat source to create a small molten pool on a substrate into which wire is fed. The electron beam and wire feed assembly are translated with respect to the substrate to follow a predetermined tool path. This process is repeated in a layer-wise fashion to fabricate metal structural components. In-process imaging has been integrated into the EBF3 system using a near-infrared (NIR) camera. The images are processed to provide thermal and spatial measurements that have been incorporated into a closed-loop control system to maintain consistent thermal conditions throughout the build. Other information in the thermal images is being used to assess quality in real time by detecting flaws in prior layers of the deposit. NIR camera incorporation into the system has improved the consistency of the deposited material and provides the potential for real-time flaw detection which, ultimately, could lead to the manufacture of better, more reliable components using this additive manufacturing process.

  20. Theory And Design Of Thermionic Electron Beam Guns

    SciTech Connect

    Iqbal, Munawar; Fazal-e-Aleem

    2005-03-17

    Electron beam technology has a long history and wide applications in various fields including high-energy physics. The unique properties, which one can develop by using different configurations, have been one of the strongest driving forces for this multi-dimensional technology. In this paper, we will take up the subject along with applications in various areas of physics. We will particularly focus on the developments of electron beam sources by our laboratory.

  1. Single electron beam rf feedback free electron laser

    DOEpatents

    Brau, C.A.; Stein, W.E.; Rockwood, S.D.

    1981-02-11

    A free electron laser system and electron beam system for a free electron laser which uses rf feedback to enhance efficiency are described. Rf energy is extracted from a single electron beam by decelerating cavities and energy is returned to accelerating cavities using rf returns, such as rf waveguides, rf feedthroughs, resonant feedthroughs, etc. This rf energy is added to rf klystron energy to reduce the required input energy and thereby enhance energy efficiency of the system.

  2. Localized conductive patterning via focused electron beam reduction of graphene oxide

    SciTech Connect

    Kim, Songkil; Henry, Mathias; Kulkarni, Dhaval D.; Zackowski, Paul; Jang, Seung Soon; Tsukruk, Vladimir V.; Fedorov, Andrei G.

    2015-03-30

    We report on a method for “direct-write” conductive patterning via reduction of graphene oxide (GO) sheets using focused electron beam induced deposition (FEBID) of carbon. FEBID treatment of the intrinsically dielectric graphene oxide between two metal terminals opens up the conduction channel, thus enabling a unique capability for nanoscale conductive domain patterning in GO. An increase in FEBID electron dose results in a significant increase of the domain electrical conductivity with improving linearity of drain-source current vs. voltage dependence, indicative of a change of graphene oxide electronic properties from insulating to semiconducting. Density functional theory calculations suggest a possible mechanism underlying this experimentally observed phenomenon, as localized reduction of graphene oxide layers via interactions with highly reactive intermediates of electron-beam-assisted dissociation of surface-adsorbed hydrocarbon molecules. These findings establish an unusual route for using FEBID as nanoscale lithography and patterning technique for engineering carbon-based nanomaterials and devices with locally tailored electronic properties.

  3. Time-dependent charge distributions in polymer films under electron beam irradiation

    SciTech Connect

    Yasuda, Masaaki; Kainuma, Yasuaki; Kawata, Hiroaki; Hirai, Yoshihiko; Tanaka, Yasuhiro; Watanabe, Rikio; Kotera, Masatoshi

    2008-12-15

    The time-dependent charge distribution in polymer film under electron beam irradiation is studied by both experiment and numerical simulation. In the experiment, the distribution is measured with the piezoinduced pressure wave propagation method. In the simulation, the initial charge distribution is obtained by the Monte Carlo method of electron scattering, and the charge drift in the specimen is simulated by taking into account the Poisson equation, the charge continuity equation, Ohm's law, and the radiation-induced conductivity. The results obtained show that the negative charge deposited in the polymer film, whose top and bottom surfaces are grounded, drifts toward both grounded electrodes and that twin peaks appear in the charge distribution. The radiation-induced conductivity plays an important role in determining the charge distribution in the polymer films under electron beam irradiation.

  4. Localized conductive patterning via focused electron beam reduction of graphene oxide

    NASA Astrophysics Data System (ADS)

    Kim, Songkil; Kulkarni, Dhaval D.; Henry, Mathias; Zackowski, Paul; Jang, Seung Soon; Tsukruk, Vladimir V.; Fedorov, Andrei G.

    2015-03-01

    We report on a method for "direct-write" conductive patterning via reduction of graphene oxide (GO) sheets using focused electron beam induced deposition (FEBID) of carbon. FEBID treatment of the intrinsically dielectric graphene oxide between two metal terminals opens up the conduction channel, thus enabling a unique capability for nanoscale conductive domain patterning in GO. An increase in FEBID electron dose results in a significant increase of the domain electrical conductivity with improving linearity of drain-source current vs. voltage dependence, indicative of a change of graphene oxide electronic properties from insulating to semiconducting. Density functional theory calculations suggest a possible mechanism underlying this experimentally observed phenomenon, as localized reduction of graphene oxide layers via interactions with highly reactive intermediates of electron-beam-assisted dissociation of surface-adsorbed hydrocarbon molecules. These findings establish an unusual route for using FEBID as nanoscale lithography and patterning technique for engineering carbon-based nanomaterials and devices with locally tailored electronic properties.

  5. A compact, versatile low-energy electron beam ion source

    SciTech Connect

    Zschornack, G.; König, J.; Schmidt, M.; Thorn, A.

    2014-02-15

    A new compact Electron Beam Ion Source, the Dresden EBIT-LE, is introduced as an ion source working at low electron beam energies. The EBIT-LE operates at an electron energy ranging from 100 eV to some keV and can easily be modified to an EBIT also working at higher electron beam energies of up to 15 keV. We show that, depending on the electron beam energy, electron beam currents from a few mA in the low-energy regime up to about 40 mA in the high-energy regime are possible. Technical solutions as well as first experimental results of the EBIT-LE are presented. In ion extraction experiments, a stable production of low and intermediate charged ions at electron beam energies below 2 keV is demonstrated. Furthermore, X-ray spectroscopy measurements confirm the possibility of using the machine as a source of X-rays from ions excited at low electron energies.

  6. Electron-beam activated GaAs-switches

    SciTech Connect

    Kirkman, G.; Hur, J.; Jiang, B.; Reinhardt, N.; Allen, R.J.; Schoenbach, K.H.

    1994-12-31

    Electron-beam excitation allows the authors to modulate the conductance of wide-gap semi-insulating semiconductors over a wide range and to use them as variable resistors and as high power switches. The penetration depth of electrons, the electron range, was computed by means of a Monte-Carlo code. For electron energies of 30 keV, it is approximately 2 micrometers. In order to activate the switch material over a larger depth, the switch material, semi-insulating GaAs, was doped over a thickness corresponding to the electron range with zinc, which form shallow acceptors in GaAs. The Zn layers serves as an efficient source of cathodoluminescence, transforming the electron energy into photon energy and therefore converting the electron-beam activated switch into a photoconductive one. Experiments with 2 mm semi-insulating GaAs-switches with p-doped cathode layer have been performed where the electron beam was injected through one of the metal contacts which were placed on either face of the GaAs wafer. The 500 ns electron beam has electron energies of up to 30 keV and current densities of several A/cm{sup 2}. The results show that electron-beam controlled GaAs switches can be safely operated at switch voltages of several kV`s and current densities of 50 A/cm{sup 2} with low energy electron-beams as control elements.

  7. Development and characterization of advanced electron beam resists

    NASA Astrophysics Data System (ADS)

    Agrawal, Ankur

    Over the past twenty years, the amount of research and development work for electron beam resists has seriously lagged that performed for optical resists. This has been due mainly to the relatively low volume use of electron beam lithography for production purposes. However, as electron beam lithography is now becoming the primary solution for achieving future critical dimension requirements in mask making and appears to be a promising NGL technology, interest in electron beam resist development has increased in recent years. The primary issue in electron beam resist design centers around finding a single resist system that combines the required sensitivity and etch resistance that is needed to enable high volume production. In this work, the primary goal was to explore the development of a novel two-component non-chemically amplified electron beam resist material for high keV (>10 keV) patterning for mask-making with: (1) high contrast, (2) high sensitivity, (3) high resolution, and, (4) high etch resistance. Poly (2-methyl-1-pentene co 2-ethoxyethyl-methallyl ether sulfone) was used as a polymeric e-beam sensitive material conjunction with a series of commercial novolac resins to formulate electron beam resists. These two-component resists have been termed sulfone-novolac system (SNS) resists. The approach used in this project is to develop a suite of experimental tools and simulation models that can be used to aid in the rational design, formulation, and characterization of new electron beam resists. The main tasks that have been addressed are: (1) development of the electron beam resist characterization tool set, (2) understanding the fundamental material behavior of a non-chemically amplified polysulfone-novolac (SNS) e-beam resist for next generation mask making, (3) lithographic process development and optimization for the SNS resists, (4) evaluation of the lithographic performance of the SNS resists using the optimized processing conditions, and (5) develop

  8. The e-SCRUB Machine: an 800-kV, 500-kW average power pulsed electron beam generator for flue-gas scrubbing

    NASA Astrophysics Data System (ADS)

    Cooper, James R.; Briggs, Ray; Crewson, Walter F.; Johnson, R. D.; Ratafia-Brown, J. A.; Richardson, W. K.; Rienstra, W. W.; Ballard, Perry G.; Cukr, Jeffrey; Cassel, R. L.; Schlitt, Leland; Genuario, R. D.; Morgan, R. D.; Tripoli, G. A.

    1995-03-01

    This paper gives an overview of electron beam dry scrubbing (EBDS) to remove SOx and NOx from flue gases of coal-fired power plants. It also describes the e-SCRUB program, a program currently underway to commercialize this process with an integrated pulsed electron beam. The electron beam, together with injected water and ammonia, causes chemical reactions which convert the SOx and NOx into commercial grade agricultural fertilizer, a usable byproduct. The e-SCRUB facility is a test bed to demonstrate the feasibility and performance of a repetitive, reliable pulsed electron beam generator operating at average power levels of up to 1 MW. This facility contains the electron beam generator and all the auxiliary and support systems required by the machine, including a computer driven central experiment control system, a 100,000 SCFM flowing dry nitrogen load which simulates the characteristics of a power plant flue, and a 2 MVA dedicated electrical service to power the machine. The e-SCRUB electron beam machine is designed to produce an 800 kV pulsed electron beam with a repetition rate of 667 pps. The energy per pulse deposited into the flue gas is approximately 750 J. The pulsed power system converts the utility power input to a 667 pps, 800 kV pulse train which powers the electron gun. The functional units of the pulsed power system will be discussed in the paper, along with some preliminary experimental results.

  9. The Physics and Applications of High Brightness Electron Beams

    NASA Astrophysics Data System (ADS)

    Palumbo, Luigi; Rosenzweig, J.; Serafini, Luca

    2007-09-01

    .]. -- Working Group 1. Summary of working group 1 on electron sources / M. Ferrario and G. Gatti. Design and RF measurements of an X-band accelerating structure for the SPARC project / D. Alesini ... [et al.]. Mitigation of RF gun breakdown by removal of tuning rods in high field regions / A.M. Cook... [et al.]. Measurements of quantum efficiency of Mg films produced by pulsed laser ablation deposition for application to bright electron sources / G. Gatti ... [et al.]. The S-band 1.6 cell RF gun correlated energy spread dependence on Pi and 0 mode relative amplitude / F. Schmerge ... [et al.]. RF gun photo-emission model for metal cathodes including time dependent emission / J.F. Schmerge ... [et al.]. Superconducting photocathodes / J. Smedley ... [et al.]. -- Working Group 2. Summary of Working Group 2: diagnostics and beam manipulation / G. Travish. Observation of coherent edge radiation emitted by a 100 Femtosecond compressed electron beam / G. Andonian, M, Dunning, E. Hemsing, J. B. Rosenzweig ... [et al.]. PARMELA simulations for PITZ: first machine studies and interpretation of measurements / M. Boscolo ... [et al.]. The LCLS single-shot relative bunch length monitor system / M.P. Dunning ... [et al.]. Beam shaping and permanent magnet quadrupole focusing with applications to the plasma wakefield accelerator / R.J. England ... [et al.]. Commissioning of the SPARC movable emittance meter and its first operation at PITZ / D. Filippetto... [et al.]. Experimental testing of dynamically optimized photoelectron beams / J.B. Rosenzweig ... [et al.]. Synchronization between the laser and electron beam in a photocathode RF gun / A. Sakumi ... [et al.]. Method of bunch radiation photochronography with 10 Femtosecond and less resolution / A. Tron and I. Merinov -- Working Group 3. New challenges in theory and modeling-summary for working group 3. L. Giannessi. Resonant modes in a 1.6 cells RF gun / M. Ferrario and C. Ronsivalle. Emittance degradation due to wake fields in a high

  10. Segmented waveguide array gratings made by electron beam lithography

    NASA Astrophysics Data System (ADS)

    Grondin, Etienne; Genest, Jonathan; Duguay, Michel A.; Beauvais, Jacques; Aimez, Vincent

    2006-09-01

    We have designed and studied the fabrication limitations for a new type of optical waveguide filter based on the concept of a "Segmented Waveguide Array Grating" (SWAG, see refs. 1,2). The idea is to make an optical waveguide consisting of a large number of segments which differ from each other by their precise length and by a precise change in one of their transverse dimensions. The transitions between different segments are abrupt in the transverse dimension on the scale of one tenth the wavelength of light in the medium and are positioned with nanometer precision along the propagation axis of light. Reflections from a given subset of these transitions add up coherently and can give a grating-like reflection spectrum. By precisely positioning the segment transitions and by setting the variable transverse dimension at precise values one can design a large variety of filtering functions. As an example we have designed a filtering function that has a nearly rectangular profile, something that would be very useful in applications of WDM optical communications. The light scattering losses at segment transitions can be minimized by choosing average transverse dimensions such that the waveguide operates near the diffraction minimum. The lithography step of simple planar SWAG devices has been carried out by means of electron beam direct writing. The waveguide materials used were 6-micron thick silica/germania layers (index 1.454) spaced from a silicon substrate by a 14-micron thick pure silica layer. Trapped electron phenomena in the silica layer were eliminated by depositing metal layers on top of the silica in order to stop electrons traversing the photoresist. SWAG patterns with sharp features were obtained and are expected to give the expected spectral filtering functions.

  11. Total Kinetic Energy Of Non-Thermal Electron-Beams In Z-Pinch Experiments

    NASA Astrophysics Data System (ADS)

    Hammel, Ben; McKee, Erik; Wallace, Matt; Presura, Radu; Covington, Aaron; Darling, Tim

    2015-11-01

    An approach to infer the total energy of energetic electron-beams generated in pulsed-power driven pinch experiments is discussed. Using x-pinch wire arrays, we measured the dynamic response of a target anode material as a result of ablative shock loading following the rapid deposition of energy from the incident electron-beam. The time-profile of the drive is obtained through measurement of bremsstrahlung emission with scintillator-PMT diagnostics. MCNP is then used to correlate electron-beam spectrum to the detected hard x-ray signal, and compared with experiments fielding a timer-resolved electron-energy analyzer. Shock strength is inferred by using a line-imaging Velocity Interferometer System for Any Reflector, which recorded the target's free-surface velocity at shock breakout. Lastly, hydrodynamic simulations in HYDRA allow us to infer the total energy of the drive under the boundary conditions of the measured drive profile and shock strength. Information on the total beam-energy provides a better understanding of plasma pinch dynamics that contribute to the observation of non-thermal bremsstrahlung and detection of cold-characteristic x-ray emission from ``hot-spots.'' Support for this work is provided by DOE/NNSA grant DE-NA0002075.

  12. Group velocity delay spectroscopy technique for industrial monitoring of electron beam induced vapors

    SciTech Connect

    Benterou, J J; Berzins, L V; Sharma, M N

    1998-09-24

    Spectroscopic techniques are ideal for characterization and process control of electron beam generated vapor plumes. Absorption based techniques work well for a wide variety of applications, but are difficult to apply to optically dense or opaque vapor plumes. We describe an approach for monitoring optically dense vapor plumes that is based on measuring the group velocity delay of a laser beam near an optical transition to determine the vapor density. This technique has a larger dynamic range than absorption spectroscopy. We describe our progress towards a robust system to monitor aluminum vaporization in an industrial environment. Aluminum was chosen because of its prevalence in high performance aircraft alloys. In these applications, composition control of the alloy constituents is critical to the deposition process. Data is presented demonstrating the superior dynamic range of the measurement. In addition, preliminary data demonstrating aluminum vapor rate control in an electron beam evaporator is presented. Alternative applications where this technique could be useful are discussed. Keywords: Group velocity delay spectroscopy, optical beat signal, optical heterodyne, index of refraction, laser absorption spectroscopy, external cavity diode laser (ECDL), electron beam vaporization, vapor density, vapor phase manufacturing, process control

  13. Electron beam melting of advanced materials and structures

    NASA Astrophysics Data System (ADS)

    Mahale, Tushar Ramkrishna

    Layered manufacturing has for long been used for the fabrication of non-functional parts using polymer-based processes. Developments in laser beam and electron beam welding technologies and their adoption to layered manufacturing has made it possible to fabricate high-density functional parts in metal irrespective of the level of complexity. The Electron Beam Melting (EBM) process by Arcam AB is one such layered manufacturing process that utilizes a focused electron beam to process metal powder, layer by layer, in a vacuum environment. Research conducted as part of this body of work looks into the development of both bulk materials in the form of metal alloys and ceramic metal-matrix composites as well as the development of tunable mechanical & thermal metamaterials. Simulation models to approximate electron beam melting were suggested using commercial finite element analysis packages. A framework was developed based on the finite difference method to simulate layered manufacturing using Arcam AB's electron beam melting process. The outputs from the simulation data could be used to better understand the local melting, grain evolution, composition and internal stresses within freeform-fabricated metal parts.

  14. Thermal imaging diagnostics of high-current electron beams.

    PubMed

    Pushkarev, A; Kholodnaya, G; Sazonov, R; Ponomarev, D

    2012-10-01

    The thermal imaging diagnostics of measuring pulsed electron beam energy density is presented. It provides control of the electron energy spectrum and a measure of the density distribution of the electron beam cross section, the spatial distribution of electrons with energies in the selected range, and the total energy of the electron beam. The diagnostics is based on the thermal imager registration of the imaging electron beam thermal print in a material with low bulk density and low thermal conductivity. Testing of the thermal imaging diagnostics has been conducted on a pulsed electron accelerator TEU-500. The energy of the electrons was 300-500 keV, the density of the electron current was 0.1-0.4 kA/cm(2), the duration of the pulse (at half-height) was 60 ns, and the energy in the pulse was up to 100 J. To register the thermal print, a thermal imager Fluke-Ti10 was used. Testing showed that the sensitivity of a typical thermal imager provides the registration of a pulsed electron beam heat pattern within one pulse with energy density over 0.1 J/cm(2) (or with current density over 10 A/cm(2), pulse duration of 60 ns and electron energy of 400 keV) with the spatial resolution of 0.9-1 mm. In contrast to the method of using radiosensitive (dosimetric) materials, thermal imaging diagnostics does not require either expensive consumables, or plenty of processing time. PMID:23126757

  15. Thermal imaging diagnostics of high-current electron beams

    SciTech Connect

    Pushkarev, A.; Kholodnaya, G.; Sazonov, R.; Ponomarev, D.

    2012-10-15

    The thermal imaging diagnostics of measuring pulsed electron beam energy density is presented. It provides control of the electron energy spectrum and a measure of the density distribution of the electron beam cross section, the spatial distribution of electrons with energies in the selected range, and the total energy of the electron beam. The diagnostics is based on the thermal imager registration of the imaging electron beam thermal print in a material with low bulk density and low thermal conductivity. Testing of the thermal imaging diagnostics has been conducted on a pulsed electron accelerator TEU-500. The energy of the electrons was 300-500 keV, the density of the electron current was 0.1-0.4 kA/cm{sup 2}, the duration of the pulse (at half-height) was 60 ns, and the energy in the pulse was up to 100 J. To register the thermal print, a thermal imager Fluke-Ti10 was used. Testing showed that the sensitivity of a typical thermal imager provides the registration of a pulsed electron beam heat pattern within one pulse with energy density over 0.1 J/cm{sup 2} (or with current density over 10 A/cm{sup 2}, pulse duration of 60 ns and electron energy of 400 keV) with the spatial resolution of 0.9-1 mm. In contrast to the method of using radiosensitive (dosimetric) materials, thermal imaging diagnostics does not require either expensive consumables, or plenty of processing time.

  16. Thermal imaging diagnostics of high-current electron beams.

    PubMed

    Pushkarev, A; Kholodnaya, G; Sazonov, R; Ponomarev, D

    2012-10-01

    The thermal imaging diagnostics of measuring pulsed electron beam energy density is presented. It provides control of the electron energy spectrum and a measure of the density distribution of the electron beam cross section, the spatial distribution of electrons with energies in the selected range, and the total energy of the electron beam. The diagnostics is based on the thermal imager registration of the imaging electron beam thermal print in a material with low bulk density and low thermal conductivity. Testing of the thermal imaging diagnostics has been conducted on a pulsed electron accelerator TEU-500. The energy of the electrons was 300-500 keV, the density of the electron current was 0.1-0.4 kA/cm(2), the duration of the pulse (at half-height) was 60 ns, and the energy in the pulse was up to 100 J. To register the thermal print, a thermal imager Fluke-Ti10 was used. Testing showed that the sensitivity of a typical thermal imager provides the registration of a pulsed electron beam heat pattern within one pulse with energy density over 0.1 J/cm(2) (or with current density over 10 A/cm(2), pulse duration of 60 ns and electron energy of 400 keV) with the spatial resolution of 0.9-1 mm. In contrast to the method of using radiosensitive (dosimetric) materials, thermal imaging diagnostics does not require either expensive consumables, or plenty of processing time.

  17. Fiber-Matrix Interface Studies on Electron Beam Cured Composites

    SciTech Connect

    Drazel, L.T.; Janke, C.J.; Yarborough, K.D.

    1999-05-23

    The recently completed Department of Energy (DOE) and industry sponsored Cooperative Research and Development Agreement (CRADA) entitled, ''Electron Beam Curing of Polymer Matrix Composites,'' determined that the interlaminar shear strength properties of the best electron beam cured IM7/epoxy composites were 19-28% lower than autoclave cured IM7/epoxy composites (i.e. IM7/977-2 and IM7/977-3). Low interlaminar shear strength is widely acknowledged as the key barrier to the successful acceptance and implementation of electron beam cured composites in the aircraft/aerospace industry. The objective of this work was to improve the interlaminar shear strength properties of electron beam cured composites by formulating and evaluating several different fiber sizings or coating materials. The researchers have recently achieved some promising results by having discovered that the application of epoxy-based, electron beam compatible sizings or coatings onto surface-treated, unsized IM7 carbon fibers improved the composite interlaminar shear strength properties by as much as 55% versus composites fabricated from surface-treated, unsized IM7 fibers. In addition, by applying these same epoxy-based sizings or coatings onto surface-treated, unsized IM7 fibers it was possible to achieve an 11% increase in the composite interlaminar shear strength compared to composites made from surface-treated, GP-sized IM7 fibers. Work is continuing in this area of research to further improve these properties.

  18. Gamma-ray generation using laser-accelerated electron beam

    NASA Astrophysics Data System (ADS)

    Park, Seong Hee; Lee, Ho-Hyung; Lee, Kitae; Cha, Yong-Ho; Lee, Ji-Young; Kim, Kyung-Nam; Jeong, Young Uk

    2011-06-01

    A compact gamma-ray source using laser-accelerated electron beam is being under development at KAERI for nuclear applications, such as, radiography, nuclear activation, photonuclear reaction, and so on. One of two different schemes, Bremsstrahlung radiation and Compton backscattering, may be selected depending on the required specification of photons and/or the energy of electron beams. Compton backscattered gamma-ray source is tunable and quasimonochromatic and requires electron beams with its energy of higher than 100 MeV to produced MeV photons. Bremsstrahlung radiation can generate high energy photons with 20 - 30 MeV electron beams, but its spectrum is continuous. As we know, laser accelerators are good for compact size due to localized shielding at the expense of low average flux, while linear RF accelerators are good for high average flux. We present the design issues for a compact gamma-ray source at KAERI, via either Bremsstrahlung radiation or Compton backscattering, using laser accelerated electron beams for the potential nuclear applications.

  19. Incubational domain characterization in lightly doped ceria

    SciTech Connect

    Li Zhipeng; Mori, Toshiyuki; John Auchterlonie, Graeme; Zou Jin; Drennan, John

    2012-08-15

    Microstructures of both Gd- and Y-doped ceria with different doping level (i.e., 10 at% and 25 at%) have been comprehensively characterized by means of high resolution transmission electron microscopy and selected area electron diffraction. Coherent nano-sized domains can be widely observed in heavily doped ceria. Nevertheless, it was found that a large amount of dislocations actually exist in lightly doped ceria instead of heavily doped ones. Furthermore, incubational domains can be detected in lightly doped ceria, with dislocations located at the interfaces. The interactions between such linear dislocations and dopant defects have been simulated accordingly. As a consequence, the formation mechanism of incubational domains is rationalized in terms of the interaction between intrinsic dislocations of doped ceria and dopant defects. This study offers the insights into the initial state and related mechanism of the formation of nano-sized domains, which have been widely observed in heavily rare-earth-doped ceria in recent years. - Graphical abstract: Interactions between dislocations and dopants lead to incubational domain formation in lightly doped ceria. Highlights: Black-Right-Pointing-Pointer Microstructures were characterized in both heavily and light Gd-/Y-doped ceria. Black-Right-Pointing-Pointer Dislocations are existed in lightly doped ceria rather than heavily doped one. Black-Right-Pointing-Pointer Interactions between dislocations and dopant defects were simulated. Black-Right-Pointing-Pointer Formation of dislocation associated incubational domain is rationalized.

  20. Advanced Accelerating Structures and Their Interaction with Electron Beams

    SciTech Connect

    Gai Wei

    2009-01-22

    In this paper, we give a brief description of several advanced accelerating structures, such as dielectric loaded waveguides, photonic band gap, metamaterials and improved iris-loaded cavities. We describe wakefields generated by passing high current electron beams through these structures, and applications of wakefields to advanced accelerator schemes. One of the keys to success for high gradient wakefield acceleration is to develop high current drive beam sources. As an example, the high current RF photo injector at the Argonne Wakefield Accelerator, passed a {approx}80 nC electron beam through a high gradient dielectric loaded structure to achieve a 100 MV/m gradient. We will summarize recent related experiments on beam-structure interactions and also discuss high current electron beam generation and propagation and their applications to wakefield acceleration.

  1. Advanced accelerating structures and their interaction with electron beams.

    SciTech Connect

    Gai, W.; High Energy Physics

    2008-01-01

    In this paper, we give a brief description of several advanced accelerating structures, such as dielectric loaded waveguides, photonic band gap, metamaterials and improved iris-loaded cavities. We describe wakefields generated by passing high current electron beams through these structures, and applications of wakefields to advanced accelerator schemes. One of the keys to success for high gradient wakefield acceleration is to develop high current drive beam sources. As an example, the high current RF photo injector at the Argonne Wakefield Accelerator, passed a {approx}80 nC electron beam through a high gradient dielectric loaded structure to achieve a 100 MV/m gradient. We will summarize recent related experiments on beam-structure interactions and also discuss high current electron beam generation and propagation and their applications to wakefield acceleration.

  2. Pulsed electron beam propagation in argon and nitrogen gas mixture

    SciTech Connect

    Kholodnaya, G. E.; Sazonov, R. V.; Ponomarev, D. V.; Remnev, G. E.; Zhirkov, I. S.

    2015-10-15

    The paper presents the results of current measurements for the electron beam, propagating inside a drift tube filled in with a gas mixture (Ar and N{sub 2}). The experiments were performed using the TEA-500 pulsed electron accelerator. The main characteristics of electron beam were as follows: 60 ns pulse duration, up to 200 J energy, and 5 cm diameter. The electron beam propagated inside the drift tube assembled of three sections. Gas pressures inside the drift tube were 760 ± 3, 300 ± 3, and 50 ± 1 Torr. The studies were performed in argon, nitrogen, and their mixtures of 33%, 50%, and 66% volume concentrations, respectively.

  3. Calculating electron beam properties in an ionized benzene channel

    SciTech Connect

    Goosman, D.R.

    1986-08-01

    We have derived formulas for the equilibrium-beam radius and other properties of an electron beam propagating in an ionized benzene channel. These formulas have been determined for two special cases. The first was for Gaussian spatial profiles for both the electron and laser beams. We obtained an analytical result for the equilibrium-beam radius, even though we included both KrF laser-induced and collisional sources of ionization of different sizes. The second case we considered was for laser and electron beams with flat radial profiles. These calculations were performed to determine if a laser-guided electron beam could reduce the focal size of an electron accelerator. We also developed a personal-computer spreadsheet program that receives 10 inputs and calculates 26 dependent quantities relating to the beam and ionization properties.

  4. Low energy electron magnetometer using a monoenergetic electron beam

    NASA Technical Reports Server (NTRS)

    Singh, J. J.; Wood, G. M.; Rayborn, G. H.; White, F. A. (Inventor)

    1983-01-01

    A low energy electron beam magnetometer utilizes near-monoenergetic electrons thereby reducing errors due to electron energy spread and electron nonuniform angular distribution. In a first embodiment, atoms in an atomic beam of an inert gas are excited to a Rydberg state and then electrons of near zero energy are detached from the Rydberg atoms. The near zero energy electrons are then accelerated by an electric field V(acc) to form the electron beam. In a second embodiment, a filament emits electrons into an electrostatic analyzer which selects electrons at a predetermined energy level within a very narrow range. These selected electrons make up the electron beam that is subjected to the magnetic field being measured.

  5. FEL gain calculation for imperfectly matched electron beams

    NASA Astrophysics Data System (ADS)

    Swent, R. L.; Berryman, K. W.

    1995-04-01

    We present here the details of an analytical small-signal gain calculation. The analysis builds on the basic one-dimensional analytical calculation by modeling the effects of finite electron beam size and imperfect matching of the electron beam to the wiggler. The calculation uses TRANSPORT [SLAC-91, Rev. 2 (1977)] parameters to describe the electron beam in order to easily take the output of beam transport calculations and use them as the input for FEL gain calculations. The model accepts an arbitrary TRANSPORT beam and includes the effects of energy spread, beam size, betatron oscillations, and focussing in the wiggle plane. The model has allowed us to calculate the range over which our FEL can be tuned by changing the electron energy alone (i.e., without changing any magnets).

  6. Spatial dose distribution in polymer pipes exposed to electron beam

    NASA Astrophysics Data System (ADS)

    Ponomarev, Alexander V.

    2016-01-01

    Non-uniform distribution of absorbed dose in cross-section of any polymeric pipe is caused by non-uniform thickness of polymer layer penetrated by unidirectional electron beam. The special computer program was created for a prompt estimation of dose non-uniformity in pipes subjected to an irradiation by 1-10 MeV electron beam. Irrespective of electron beam energy, the local doses absorbed in the bulk of a material can be calculated on the basis of the universal correlations offered in the work. Incomplete deceleration of electrons in shallow layers of a polymer was taken into account. Possibilities for wide variation of pipe sizes, polymer properties and irradiation modes were provided by the algorithm. Both the unilateral and multilateral irradiation can be simulated.

  7. Ground Base Skylab Electron Beam Welds in Tantalum

    NASA Technical Reports Server (NTRS)

    2004-01-01

    Comparison of ground-based (left) and Skylab (right) electron beam welds in pure tantalum (Ta) (10X magnification). Residual votices left behind in the ground-based sample after the electron beam passed were frozen into the grain structure. These occurred because of the rapid cooling rate at the high temperature. Although the thermal characteristics and electron beam travel speeds were comparable for the skylab sample, the residual vortices were erased in the grain structure. This may have been due to the fact that final grain size of the solidified material was smaller in the Skylab sample compared to the ground-based sample. The Skylab sample was processed in the M512 Materials Processing Facility (MPF) during Skylab SL-2 Mission. Principal Investigator was Richard Poorman.

  8. Portable radiography system using a relativistic electron beam

    DOEpatents

    Hoeberling, Robert F.

    1990-01-01

    A portable radiographic generator is provided with an explosive magnetic flux compression generator producing the high voltage necessary to generate a relativistic electron beam. The relativistic electron beam is provided with target materials which generates the desired radiographic pulse. The magnetic flux compression generator may require at least two conventional explosively driven generators in series to obtain a desired output voltage of at least 1 MV. The cathode and anode configuration of the diode are selected to provide a switching action wherein a high impedance load is presented to the magnetic flux compression generator when the high voltage is being generated, and thereafter switching to a low impedance load to generate the relativistic electron beam. Magnetic flux compression generators can be explosively driven and provided in a relatively compact, portable form for use with the relativistic x-ray equipment.

  9. Portable radiography system using a relativistic electron beam

    DOEpatents

    Hoeberling, R.F.

    1987-09-22

    A portable radiographic generator is provided with an explosive magnetic flux compression generator producing the high voltage necessary to generate a relativistic electron beam. The relativistic electron beam is provided with target materials which generates the desired radiographic pulse. The magnetic flux compression generator may require at least two conventional explosively driven generators in series to obtain a desired output voltage of at least 1 MV. The cathode and anode configuration of the diode are selected to provide a switching action wherein a high impedance load is presented to the magnetic flux compression generator when the high voltage is being generated, and thereafter switching to a low impedance load to generate the relativistic electron beam. Magnetic flux compression generators can be explosively driven and provided in a relatively compact, portable form for use with the relativistic x-ray equipment. 8 figs.

  10. Image tube. [deriving electron beam replica of image

    NASA Technical Reports Server (NTRS)

    Hallam, K. L.; Johnson, C. B. (Inventor)

    1974-01-01

    An optical image is projected onto a planar surface of a photocathode that derives an electron beam replica of the image. A target electrode displaced relative to the photocathode so that it does not obstruct the optical image includes a planar surface for receiving and deriving an accurate replica of the electron beam image. The two planar surfaces are parallel. The electron beam image is focused on the target electrode by providing throughout a region that extends between the planar surfaces of the photocathode and receiving electrode, constant homogeneous dc electric and magnetic fields. The electric field extends in a direction perpendicular to the planar surfaces while the magnetic field extends along a straight line that intersects the photocathode and target electrode at an acute angle.

  11. Field effect transistors and photodetectors based on nanocrystalline graphene derived from electron beam induced carbonaceous patterns.

    PubMed

    Kurra, Narendra; Bhadram, Venkata Srinu; Narayana, Chandrabhas; Kulkarni, G U

    2012-10-26

    We describe a transfer-free method for the fabrication of nanocrystalline graphene (nc-graphene) on SiO(2) substrates directly from patterned carbonaceous deposits. The deposits were produced from the residual hydrocarbons present in the vacuum chamber without any external source by using an electron beam induced carbonaceous deposition (EBICD) process. Thermal treatment under vacuum conditions in the presence of Ni catalyst transformed the EBIC deposit into nc-graphene patterns, confirmed using Raman and TEM analysis. The nc-graphene patterns have been employed as an active p-type channel material in a field effect transistor (FET) which showed a hole mobility of ~90 cm(2) V(-1) s(-1). The nc-graphene also proved to be suitable material for IR detection.

  12. Field effect transistors and photodetectors based on nanocrystalline graphene derived from electron beam induced carbonaceous patterns

    NASA Astrophysics Data System (ADS)

    Kurra, Narendra; Srinu Bhadram, Venkata; Narayana, Chandrabhas; Kulkarni, G. U.

    2012-10-01

    We describe a transfer-free method for the fabrication of nanocrystalline graphene (nc-graphene) on SiO2 substrates directly from patterned carbonaceous deposits. The deposits were produced from the residual hydrocarbons present in the vacuum chamber without any external source by using an electron beam induced carbonaceous deposition (EBICD) process. Thermal treatment under vacuum conditions in the presence of Ni catalyst transformed the EBIC deposit into nc-graphene patterns, confirmed using Raman and TEM analysis. The nc-graphene patterns have been employed as an active p-type channel material in a field effect transistor (FET) which showed a hole mobility of ˜90 cm2 V-1 s-1. The nc-graphene also proved to be suitable material for IR detection.

  13. Laser cooling of electron beams for linear colliders

    SciTech Connect

    Telnov, V.

    1996-10-01

    A novel method of electron beam cooling is considered which can be used for linear colliders. The electron beam is cooled during collision with focused powerful laser pulse. With reasonable laser parameters (laser flash energy about 10 J) one can decrease transverse beam emittances by a factor about 10 per one stage. The ultimate transverse emittances are much below that given by other methods. Depolarization of a beam during the cooling is about 5--15% for one stage. This method is especially useful for photon colliders and open new possibilities for e{sup +}e{sup {minus}} colliders and x-ray FEL based on high energy linacs.

  14. Precision Absolute Beam Current Measurement of Low Power Electron Beam

    SciTech Connect

    Ali, M. M.; Bevins, M. E.; Degtiarenko, P.; Freyberger, A.; Krafft, G. A.

    2012-11-01

    Precise measurements of low power CW electron beam current for the Jefferson Lab Nuclear Physics program have been performed using a Tungsten calorimeter. This paper describes the rationale for the choice of the calorimeter technique, as well as the design and calibration of the device. The calorimeter is in use presently to provide a 1% absolute current measurement of CW electron beam with 50 to 500 nA of average beam current and 1-3 GeV beam energy. Results from these recent measurements will also be presented.

  15. Characteristics of an electron-beam rocket pellet accelerator

    SciTech Connect

    Tsai, C.C.; Foster, C.A.; Schechter, D.E.

    1989-01-01

    An electron-beam rocket pellet accelerator has been designed, built, assembled, and tested as a proof-of-principle (POP) apparatus. The main goal of accelerators based on this concept is to use intense electron-beam heating and ablation of a hydrogen propellant stick to accelerate deuterium and/or tritium pellets to ultrahigh speeds (10 to 20 km/s) for plasma fueling of next-generation fusion devices such as the International Thermonuclear Engineering Reactor (ITER). The POP apparatus is described and initial results of pellet acceleration experiments are presented. Conceptual ultrahigh-speed pellet accelerators are discussed. 14 refs., 8 figs.

  16. Pulsed electron beams for flue-gas treatment

    NASA Astrophysics Data System (ADS)

    Mesyats, Gennady A.; Novoselov, Yuri N.; Kuznetsov, D. L.

    1995-03-01

    The development of industrial society creates serious threats to the safe existence of the biosphere, including man. Cleaning air from toxic exhausts becomes therefore one of the challenges. The global problem of air cleaning can be solved in a number of ways. We restrict our attention to one of the possible methods, the use of pulsed electron beams to clean sulfur oxides from the flue gases of power plants. Irradiation of flue gases by the increased density of pulsed electron beams permits a charges, excited particle concentration that is optical for the removal of specific toxic impurities. We present the most important results of these experiments.

  17. High-Power Microwave Switch Employing Electron Beam Triggering

    SciTech Connect

    Hirshfield, Jay L

    2012-09-19

    A high-power active microwave pulse compressor is described that modulates the quality factor Q of the energy storage cavity by a new means involving mode conversion controlled by a triggered electron-beam discharge through a switch cavity. The electron beam is emitted from a diamond-coated molybdenum cathode. This report describes the principle of operation, the design of the switch, the configuration used for the test, and the experimental results. The pulse compressor produced output pulses with 140 - 165 MW peak power, power gain of 16 - 20, and pulse duration of 16 - 20 ns at a frequency of 11.43 GHz.

  18. Hollow Electron Beam Collimator: R and D Status Report

    SciTech Connect

    Stancari, G.; Drozhdin, A.; Kuznetsov, G.; Shiltsev, V.; Valishev, A.; Vorobiev, L.; Kabantsev, A.

    2010-11-04

    Magnetically confined hollow electron beams for controlled halo removal in high-energy colliders such as the Tevatron or the LHC may extend traditional collimation systems beyond the intensity limits imposed by tolerable material damage. They may also improve collimation performance by suppressing loss spikes due to beam jitter and by increasing capture efficiency. A hollow electron gun was designed and built. Its performance and stability were measured at the Fermilab test stand. The gun will be installed in one of the existing Tevatron electron lenses for preliminary tests of the hollow-beam collimator concept, addressing critical issues such as alignment and instabilities of the overlapping proton and electron beams.

  19. Development of hollow electron beams for proton and ion collimation

    SciTech Connect

    Stancari, G.; Drozhdin, A.I.; Kuznetsov, G.; Shiltsev, V.; Still, D.A.; Valishev, A.; Vorobiev, L.G.; Assmann, R.; Kabantsev, A.; /UC, San Diego

    2010-06-01

    Magnetically confined hollow electron beams for controlled halo removal in high-energy colliders such as the Tevatron or the LHC may extend traditional collimation systems beyond the intensity limits imposed by tolerable material damage. They may also improve collimation performance by suppressing loss spikes due to beam jitter and by increasing capture efficiency. A hollow electron gun was designed and built. Its performance and stability were measured at the Fermilab test stand. The gun will be installed in one of the existing Tevatron electron lenses for preliminary tests of the hollow-beam collimator concept, addressing critical issues such as alignment and instabilities of the overlapping proton and electron beams.

  20. Electron beam enhanced surface modification for making highly resolved structures

    DOEpatents

    Pitts, J.R.

    1984-10-10

    A method for forming high resolution submicron structures on a substrate is provided by direct writing with a submicron electron beam in a partial pressure of a selected gas phase characterized by the ability to dissociate under the beam into a stable gaseous leaving group and a reactant fragment that combines with the substrate material under beam energy to form at least a surface compound. Variations of the method provide semiconductor device regions on doped silicon substrates, interconnect lines between active sites, three dimensional electronic chip structures, electron beam and optical read mass storage devices that may include color differentiated data areas, and resist areas for use with selective etching techniques.

  1. Electron beam accelerator with magnetic pulse compression and accelerator switching

    DOEpatents

    Birx, Daniel L.; Reginato, Louis L.

    1988-01-01

    An electron beam accelerator comprising an electron beam generator-injector to produce a focused beam of .gtoreq.0.1 MeV energy electrons; a plurality of substantially identical, aligned accelerator modules to sequentially receive and increase the kinetic energies of the beam electrons by about 0.1-1 MeV per module. Each accelerator module includes a pulse-forming network that delivers a voltage pulse to the module of substantially .gtoreq.0.1-1 MeV maximum energy over a time duration of .ltoreq.1 .mu.sec.

  2. Electron beam accelerator with magnetic pulse compression and accelerator switching

    DOEpatents

    Birx, Daniel L.; Reginato, Louis L.

    1987-01-01

    An electron beam accelerator comprising an electron beam generator-injector to produce a focused beam of .gtoreq.0.1 MeV energy electrons; a plurality of substantially identical, aligned accelerator modules to sequentially receive and increase the kinetic energies of the beam electrons by about 0.1-1 MeV per module. Each accelerator module includes a pulse-forming network that delivers a voltage pulse to the module of substantially 0.1-1 MeV maximum energy over a time duration of .ltoreq.1 .mu.sec.

  3. Electron beam collector for a microwave power tube

    DOEpatents

    Dandl, Raphael A.

    1980-01-01

    This invention relates to a cylindrical, electron beam collector that efficiently couples the microwave energy out of a high power microwave source while stopping the attendant electron beam. The interior end walls of the collector are a pair of facing parabolic mirrors and the microwave energy from an input horn is radiated between the two mirrors and reassembled at the entrance to the output waveguide where the transmitted mode is reconstructed. The mode transmission through the collector of the present invention has an efficiency of at least 94%.

  4. Generation of subnanosecond electron beams in air at atmospheric pressure

    NASA Astrophysics Data System (ADS)

    Kostyrya, I. D.; Tarasenko, V. F.; Baksht, E. Kh.; Burachenko, A. G.; Lomaev, M. I.; Rybka, D. V.

    2009-11-01

    Optimum conditions for the generation of runaway electron beams with maximum current amplitudes and densities in nanosecond pulsed discharges in air at atmospheric pressure are determined. A supershort avalanche electron beam (SAEB) with a current amplitude of ˜30 A, a current density of ˜20 A/cm2, and a pulse full width at half maximum (FWHM) of ˜100 ps has been observed behind the output foil of an air-filled diode. It is shown that the position of the SAEB current maximum relative to the voltage pulse front exhibits a time shift that varies when the small-size collector is moved over the foil surface.

  5. Pulsed-electron-beam annealing of ion-implantation damage

    NASA Technical Reports Server (NTRS)

    Greenwald, A. C.; Kirkpatrick, A. R.; Little, R. G.; Minnucci, J. A.

    1979-01-01

    Short-duration high-intensity pulsed electron beams have been used to anneal ion-implantation damage in silicon and to electrically activate the dopant species. Lattice regrowth and dopant activation were determined using He(+)-4 backscattering, SEM, TEM, and device performance characteristics as diagnostic techniques. The annealing mechanism is believed to be liquid-phase epitaxial regrowth initiating from the substrate. The high-temperature transient pulse produced by the electron beam causes the dopant to diffuse rapidly in the region where the liquid state is achieved.

  6. Electron beam enhanced surface modification for making highly resolved structures

    DOEpatents

    Pitts, John R.

    1986-01-01

    A method for forming high resolution submicron structures on a substrate is provided by direct writing with a submicron electron beam in a partial pressure of a selected gas phase characterized by the ability to dissociate under the beam into a stable gaseous leaving group and a reactant fragment that combines with the substrate material under beam energy to form at least a surface compound. Variations of the method provide semiconductor device regions on doped silicon substrates, interconnect lines between active sites, three dimensional electronic chip structures, electron beam and optical read mass storage devices that may include color differentiated data areas, and resist areas for use with selective etching techniques.

  7. Electron beam accelerator with magnetic pulse compression and accelerator switching

    DOEpatents

    Birx, D.L.; Reginato, L.L.

    1984-03-22

    An electron beam accelerator is described comprising an electron beam generator-injector to produce a focused beam of greater than or equal to .1 MeV energy electrons; a plurality of substantially identical, aligned accelerator modules to sequentially receive and increase the kinetic energies of the beam electron by about .1-1 MeV per module. Each accelerator module includes a pulse-forming network that delivers a voltage pulse to the module of substantially .1-1 MeV maximum energy over a time duration of less than or equal to 1 ..mu..sec.

  8. Radial electron-beam-breakup transit-time oscillator

    DOEpatents

    Kwan, Thomas J. T.; Mostrom, Michael A.

    1998-01-01

    A radial electron-beam-breakup transit-time oscillator (RBTO) provides a compact high power microwave generator. The RBTO includes a coaxial vacuum transmission line having an outer conductor and an inner conductor. The inner conductor defines an annular cavity with dimensions effective to support an electromagnetic field in a TEM.sub.00m mode. A radial field emission cathode is formed on the outer conductor for providing an electron beam directed toward the annular cavity electrode. Microwave energy is then extracted from the annular cavity electrode.

  9. Study of a non-intrusive electron beam radius diagnostic

    SciTech Connect

    Kwan, T.J.T.; DeVolder, B.G.; Goldstein, J.C.; Snell, C.M.

    1997-12-01

    The authors have evaluated the usefulness and limitation of a non-intrusive beam radius diagnostic which is based on the measurement of the magnetic moment of a high-current electron beam in an axisymmetric focusing magnetic field, and relates the beam root-mean-square (RMS) radius to the change in magnetic flux through a diamagnetic loop encircling the beam. An analytic formula that gives the RMS radius of the electron beam at a given axial position and a given time is derived and compared with results from a 2-D particle-in-cell code. The study has established criteria for its validity and optimal applications.

  10. Ignition of organic explosives by an electron beam

    NASA Astrophysics Data System (ADS)

    Ivanov, Georgy A.; Khaneft, Alexander V.

    2015-01-01

    A numerical simulation of the ignition of organic explosives (PETN, HMX, RDX, TATB) with an electron beam was performed. A criterion for the ignition of energetic materials with a melting point below the temperature of ignition is obtained. The results of numerical calculations of the critical energy density of the electron beam are consistent with the criterion of ignition. Calculations of the critical energy density of PETN ignition in good agreement with the experiment. The most sensitive is PETN and the most heat-resistant is TATB.

  11. Adhesion and Atomic Structures of Gold on Ceria Nanostructures:The Role of Surface Structure and Oxidation State of Ceria Supports

    SciTech Connect

    Lin, Yuyuan; Wu, Zili; Wen, Jianguo; Poeppelmeier, Kenneth R; Marks, Laurence D

    2015-01-01

    Recent advances in heterogeneous catalysis have demonstrated that oxides supports with the same material but different shapes can result in metal catalysts with distinct catalytic properties. The shape-dependent catalysis was not well-understood owing to the lack of direct visualization of the atomic structures at metal-oxide interface. Herein, we utilized aberration-corrected electron microscopy and revealed the atomic structures of gold particles deposited on ceria nanocubes and nanorods with {100} or {111} facets exposed. For the ceria nanocube support, gold nanoparticles have extended atom layers at the metal-support interface. In contrast, regular gold nanoparticles and rafts are present on the ceria nanorod support. After hours of water gas shift reaction, the extended gold atom layers and rafts vanish, which is associated with the decrease of the catalytic activities. By understanding the atomic structures of the support surfaces, metal-support interfaces, and morphologies of the gold particles, a direct structure-property relationship is established.

  12. Electrochemical synthesis and properties of ceria films grown on stainless steel

    NASA Astrophysics Data System (ADS)

    Živković, Lj. S.; Lair, V.; Lupan, O.; Ringuedé, A.

    2011-12-01

    Electrochemical synthesis of ceria films was performed on a stainless steel substrate in view of Solid Oxide Fuel Cells (SOFC) applications. Films were obtained from aqueous nitrate solutions via cathodic deposition method at room temperature. A constant potential value of -0.8 V/(SCE) was applied to reduce the molecular oxygen as hydroxide precursor, leading to a formation of adherent, homogeneous and covering films in 20 min deposition time. Structure, morphology and composition of as-grown coatings were studied by X-ray diffraction, Raman and energy-dispersive X-ray spectroscopy, as well as scanning electron microscopy. Cubic fluorite-type nanostructured ceria of leaf-like particles was synthesized. Thermal annealing (600°C, 1 h) was found to enhance ceria crystallinity.

  13. NiMnGa nanostructures produced by electron beam lithography and Ar-ion etching

    NASA Astrophysics Data System (ADS)

    Auernhammer, D.; Schmitt, M.; Ohtsuka, M.; Kohl, M.

    2008-05-01

    The technologies of electron beam lithography, dry etching and systems integration are investigated to fabricate a series of Ni-Mn-Ga double-beam structures designed with decreasing critical dimensions of 10 μm, 1 μm and 400 nm. Ni-Mn-Ga thin films of 1 μm thickness are deposited by magnetron sputtering and heat-treated in free-standing condition after selective removal of the substrate. Differential scanning calorimetry and electrical resistance measurements on the films show the characteristic features of martensitic transformation above room temperature. First optical beam deflection experiments demonstrate the magnetic and thermal actuation performance of the double-beam structures.

  14. Erbium oxide thin films on Si(100) obtained by laser ablation and electron beam evaporation

    NASA Astrophysics Data System (ADS)

    Queralt, X.; Ferrater, C.; Sánchez, F.; Aguiar, R.; Palau, J.; Varela, M.

    1995-02-01

    Erbium oxide thin films have been obtained by laser ablation and electron beam evaporation techniques on Si(100) substrates. The samples were grown under different conditions of oxygen atmosphere and substrate temperature without any oxidation process after deposition. The crystal structure has been studied by X-ray diffraction. Films obtained by laser ablation are highly textured in the [ hhh] direction, although this depends on the conditions of oxygen pressure and substrate temperature. In order to study the depth composition profile of the thin films and the interdiffusion of erbium metal and oxygen towards the silicon substrates, X-ray photoelectron spectroscopy analyses have been carried out.

  15. Characterization of the virtual source in an electron-beam evaporation system

    SciTech Connect

    Miller, M.D.; Biltoft, P.J.; Benapfl, M. )

    1993-09-01

    We have determined the size and location of the distributed virtual source'' of an electron-beam evaporation source using a mask/shadowing technique. By depositing copper through slit masks onto glass witnesses, then measuring the width of the deposition pattern it was possible to calculate the size and location of the virtual source. We determined the source size to be 3.9[plus minus]1.0 cm side to side, 4.8[plus minus]0.5 cm front to back, 4.4[plus minus]0.5 cm across one diagonal and 4.4[plus minus]0.5 cm across the other diagonal while its location was 9[plus minus]3 cm above the hearth. The size of the virtual source is dramatically larger than the area created by the electron beam rastering across the surface of the muffin. This data may be useful when high-tolerance vapor deposition into porous materials is desired (as in microchannel plates). In this application, the angle between the virtual source and the substrate may be critical for effective coating of the channels.

  16. Electron Beam Cured Epoxy Resin Composites for High Temperature Applications

    NASA Technical Reports Server (NTRS)

    Janke, Christopher J.; Dorsey, George F.; Havens, Stephen J.; Lopata, Vincent J.; Meador, Michael A.

    1997-01-01

    Electron beam curing of Polymer Matrix Composites (PMC's) is a nonthermal, nonautoclave curing process that has been demonstrated to be a cost effective and advantageous alternative to conventional thermal curing. Advantages of electron beam curing include: reduced manufacturing costs; significantly reduced curing times; improvements in part quality and performance; reduced environmental and health concerns; and improvement in material handling. In 1994 a Cooperative Research and Development Agreement (CRADA), sponsored by the Department of Energy Defense Programs and 10 industrial partners, was established to advance the electron beam curing of PMC technology. Over the last several years a significant amount of effort within the CRADA has been devoted to the development and optimization of resin systems and PMCs that match the performance of thermal cured composites. This highly successful materials development effort has resulted in a board family of high performance, electron beam curable cationic epoxy resin systems possessing a wide range of excellent processing and property profiles. Hundreds of resin systems, both toughened and untoughened, offering unlimited formulation and processing flexibility have been developed and evaluated in the CRADA program.

  17. The physics of FEL in an infinite electron beam

    SciTech Connect

    Wang, G.; Litvinenko, V.N.; Webb, S.

    2010-10-07

    We solve linearized Vlasov-Maxwell FEL equations for a 3-D perturbation in the infinite electron beam with Lorentzian energy distributions using paraxial approximation. We present analytical solutions for various initial perturbations and discuss the effect of optical guiding in such system.

  18. Characteristics of an electron-beam rocket pellet accelerator

    SciTech Connect

    Tsai, C.C.; Foster, C.A.; Milora, S.L.; Schechter, D.E.

    1991-01-01

    A proof-of-principle (POP) electron-beam pellet accelerator has been developed and used for accelerating hydrogen and deuterium pellets. An intact hydrogen pellet was accelerated to a speed of 460 m/s by an electron beam of 13.5 keV. 0.3 A, and 2 ms. The maximum speed is limited by the acceleration path length (0.4 m) and pellet integrity. Experimental data have been collected for several hundred hydrogen pellets, which were accelerated by electron beams with parameters of voltage up to 16 kV, current up to 0.4 A, and pulse length up to 10 ms. Preliminary results reveal that the measured burn velocity increases roughly with the square of the beam voltage, as the theoretical model predicts. The final pellet velocity is proportional to the exhaust velocity, which increases with the beam power. To reach the high exhaust velocity needed for accelerating pellets to >1000 m/s, a new electron gun, with its cathode indirectly heated by a graphite heater and an electron beam, is being developed to increase beam current and power. A rocket casing or shell around the pellet has been designed and developed to increase pellet strength and improve the electron-rocket coupling efficiency. We present the characteristics of this pellet accelerator, including new improvements. 13 refs., 6 figs.

  19. Flat-Lens Focusing of Electron Beams in Graphene

    NASA Astrophysics Data System (ADS)

    Tang, Yang; Cao, Xiyuan; Guo, Ran; Zhang, Yanyan; Che, Zhiyuan; Yannick, Fouodji T.; Zhang, Weiping; Du, Junjie

    2016-09-01

    Coupling electron beams carrying information into electronic units is fundamental in microelectronics. This requires precision manipulation of electron beams through a coupler with a good focusing ability. In graphene, the focusing of wide electron beams has been successfully demonstrated by a circular p-n junction. However, it is not favorable for information coupling since the focal length is so small that the focal spot locates inside the circular gated region, rather than in the background region. Here, we demonstrate that an array of gate-defined quantum dots, which has gradually changing lattice spacing in the direction transverse to propagation, can focus electrons outside itself, providing a possibility to make a coupler in graphene. The focusing effect can be understood as due to the gradient change of effective refractive indices, which are defined by the local energy band in a periodic potential. The strong focusing can be achieved by suitably choosing the lattice gradient and the layer number in the incident direction, offering an effective solution to precision manipulation of electron beams with wide electron energy range and high angular tolerance.

  20. Electron-beam induced synthesis of nanostructures: a review.

    PubMed

    Gonzalez-Martinez, I G; Bachmatiuk, A; Bezugly, V; Kunstmann, J; Gemming, T; Liu, Z; Cuniberti, G; Rümmeli, M H

    2016-06-01

    As the success of nanostructures grows in modern society so does the importance of our ability to control their synthesis in precise manners, often with atomic precision as this can directly affect the final properties of the nanostructures. Hence it is crucial to have both deep insight, ideally with real-time temporal resolution, and precise control during the fabrication of nanomaterials. Transmission electron microscopy offers these attributes potentially providing atomic resolution with near real time temporal resolution. In addition, one can fabricate nanostructures in situ in a TEM. This can be achieved with the use of environmental electron microscopes and/or specialized specimen holders. A rather simpler and rapidly growing approach is to take advantage of the imaging electron beam as a tool for in situ reactions. This is possible because there is a wealth of electron specimen interactions, which, when implemented under controlled conditions, enable different approaches to fabricate nanostructures. Moreover, when using the electron beam to drive reactions no specialized specimen holders or peripheral equipment is required. This review is dedicated to explore the body of work available on electron-beam induced synthesis techniques with in situ capabilities. Particular emphasis is placed on the electron beam-induced synthesis of nanostructures conducted inside a TEM, viz. the e-beam is the sole (or primary) agent triggering and driving the synthesis process.

  1. Flat-Lens Focusing of Electron Beams in Graphene.

    PubMed

    Tang, Yang; Cao, Xiyuan; Guo, Ran; Zhang, Yanyan; Che, Zhiyuan; Yannick, Fouodji T; Zhang, Weiping; Du, Junjie

    2016-01-01

    Coupling electron beams carrying information into electronic units is fundamental in microelectronics. This requires precision manipulation of electron beams through a coupler with a good focusing ability. In graphene, the focusing of wide electron beams has been successfully demonstrated by a circular p-n junction. However, it is not favorable for information coupling since the focal length is so small that the focal spot locates inside the circular gated region, rather than in the background region. Here, we demonstrate that an array of gate-defined quantum dots, which has gradually changing lattice spacing in the direction transverse to propagation, can focus electrons outside itself, providing a possibility to make a coupler in graphene. The focusing effect can be understood as due to the gradient change of effective refractive indices, which are defined by the local energy band in a periodic potential. The strong focusing can be achieved by suitably choosing the lattice gradient and the layer number in the incident direction, offering an effective solution to precision manipulation of electron beams with wide electron energy range and high angular tolerance. PMID:27628099

  2. Electron beam switched discharge for rapidly pulsed lasers

    DOEpatents

    Pleasance, Lyn D.; Murray, John R.; Goldhar, Julius; Bradley, Laird P.

    1981-01-01

    Method and apparatus for electrical excitation of a laser gas by application of a pulsed voltage across the gas, followed by passage of a pulsed, high energy electron beam through the gas to initiate a discharge suitable for laser excitation. This method improves upon current power conditioning techniques and is especially useful for driving rare gas halide lasers at high repetition rates.

  3. Electron-beam induced synthesis of nanostructures: a review

    NASA Astrophysics Data System (ADS)

    Gonzalez-Martinez, I. G.; Bachmatiuk, A.; Bezugly, V.; Kunstmann, J.; Gemming, T.; Liu, Z.; Cuniberti, G.; Rümmeli, M. H.

    2016-06-01

    As the success of nanostructures grows in modern society so does the importance of our ability to control their synthesis in precise manners, often with atomic precision as this can directly affect the final properties of the nanostructures. Hence it is crucial to have both deep insight, ideally with real-time temporal resolution, and precise control during the fabrication of nanomaterials. Transmission electron microscopy offers these attributes potentially providing atomic resolution with near real time temporal resolution. In addition, one can fabricate nanostructures in situ in a TEM. This can be achieved with the use of environmental electron microscopes and/or specialized specimen holders. A rather simpler and rapidly growing approach is to take advantage of the imaging electron beam as a tool for in situ reactions. This is possible because there is a wealth of electron specimen interactions, which, when implemented under controlled conditions, enable different approaches to fabricate nanostructures. Moreover, when using the electron beam to drive reactions no specialized specimen holders or peripheral equipment is required. This review is dedicated to explore the body of work available on electron-beam induced synthesis techniques with in situ capabilities. Particular emphasis is placed on the electron beam-induced synthesis of nanostructures conducted inside a TEM, viz. the e-beam is the sole (or primary) agent triggering and driving the synthesis process.

  4. Atomic physics measurements in an electron Beam Ion Trap

    SciTech Connect

    Marrs, R.E.; Beiersdorfer, P.; Bennett, C.; Chen, M.H.; Cowan, T.; Dietrich, D.; Henderson, J.R.; Knapp, D.A.; Osterheld, A.; Schneider, M.B.

    1989-03-01

    An electron Beam Ion Trap at Lawrence Livermore National Laboratory is being used to produce and trap very-highly-charged ions (q less than or equal to 70/+/) for x-ray spectroscopy measurements. Recent measurements of transition energies and electron excitation cross sections for x-ray line emission are summarized. 13 refs., 10 figs.

  5. Electron beam irradiation of gemstone for color enhancement

    NASA Astrophysics Data System (ADS)

    Idris, Sarada; Ghazali, Zulkafli; Hashim, Siti A'iasah; Ahmad, Shamshad; Jusoh, Mohd Suhaimi

    2012-09-01

    Numerous treatment of gemstones has been going on for hundreds of years for enhancing color and clarity of gems devoid of these attributes. Whereas previous practices included fraudulent or otherwise processes to achieve the color enhancement, the ionizing radiation has proven to be a reliable and reproducible technique. Three types of irradiation processes include exposure to gamma radiation, electron beam irradiation and the nuclear power plants. Electron Beam Irradiation of Gemstone is a technique in which a gemstone is exposed to highly ionizing radiation electron beam to knock off electrons to generate color centers culminating in introduction of deeper colors. The color centers may be stable or unstable. Below 9MeV, normally no radioactivity is introduced in the exposed gems. A study was conducted at Electron Beam Irradiation Centre (Alurtron) for gemstone color enhancement by using different kind of precious gemstones obtained from Pakistan. The study shows that EB irradiation not only enhances the color but can also improves the clarity of some type of gemstones. The treated stones included kunzite, tourmaline, topaz, quartz, aquamarine and cultured pearls. Doses ranging from 25 kGy to 200 KGy were employed to assess the influence of doses on color and clarity and to select the optimum doses. The samples used included both the natural and the faceted gemstones. It is concluded that significant revenue generation is associated with the enhancement of the color in clarity of gemstones which are available at very cheap price in the world market.

  6. Flat-Lens Focusing of Electron Beams in Graphene.

    PubMed

    Tang, Yang; Cao, Xiyuan; Guo, Ran; Zhang, Yanyan; Che, Zhiyuan; Yannick, Fouodji T; Zhang, Weiping; Du, Junjie

    2016-09-15

    Coupling electron beams carrying information into electronic units is fundamental in microelectronics. This requires precision manipulation of electron beams through a coupler with a good focusing ability. In graphene, the focusing of wide electron beams has been successfully demonstrated by a circular p-n junction. However, it is not favorable for information coupling since the focal length is so small that the focal spot locates inside the circular gated region, rather than in the background region. Here, we demonstrate that an array of gate-defined quantum dots, which has gradually changing lattice spacing in the direction transverse to propagation, can focus electrons outside itself, providing a possibility to make a coupler in graphene. The focusing effect can be understood as due to the gradient change of effective refractive indices, which are defined by the local energy band in a periodic potential. The strong focusing can be achieved by suitably choosing the lattice gradient and the layer number in the incident direction, offering an effective solution to precision manipulation of electron beams with wide electron energy range and high angular tolerance.

  7. Electron beam curing of thin film polymer dielectrics

    NASA Astrophysics Data System (ADS)

    Manepalli, Rahul Nagaraj

    2000-10-01

    Thin film polymer dielectrics are widely used in the microelectronics industry for a variety of applications. In order to be used for these applications, polymers are required to have excellent dielectric, chemical and mechanical properties with dimensional stability at high temperatures. Typically, these polymers are solvent cast onto the desired substrate and a cure process involving treatment at high temperatures for several hours is necessary to chemically cure the film. In this study, a novel cure technique involving electron beam exposure of polymer dielectrics is investigated. It is proposed to replace the long, conventional thermal cure cycle with a shorter, electron beam cure process. Five commercially available and commonly used polymer dielectrics are chosen for this study. The polymers chosen comprise a variety of different backbone chemistries, (polyimides, benzocyclobutene and polynorbornene) which encompass the classes of materials presently used in the microelectronics industry. The electrical, mechanical and optical properties in the film are characterized and correlated to the electron beam dose. Chemical changes in film are examined through FTIR and 13C solid state NMR spectroscopy. The effect of electron beam induced crosslinking on the multilayering behavior in certain polymer systems is also investigated.

  8. Split glass tube assures quality in electron beam brazing

    NASA Technical Reports Server (NTRS)

    Kressin, W. J.

    1966-01-01

    Sealed enclosure of heat-resistant glass tubing and silicone rubber molds provide good visibility for electron beam brazing of metal tubes in an inert gas atmosphere. The glass tubing and rubber molds, which are bonded together, are easily applied to and removed from the brazing area by operation of a clamp.

  9. PEPPo: Using a Polarized Electron Beam to Produce Polarized Positrons

    SciTech Connect

    Adeyemi, Adeleke H.

    2015-09-01

    Polarized positron beams have been identified as either an essential or a significant ingredient for the experimental program of both the present and next generation of lepton accelerators (JLab, Super KEK B, ILC, CLIC). An experiment demonstrating a new method for producing polarized positrons has been performed at the Continuous Electron Beam Accelerator Facility at Jefferson Lab. The PEPPo (Polarized Electrons for Polarized Positrons) concept relies on the production of polarized e⁻/e⁺ pairs from the bremsstrahlung radiation of a longitudinally polarized electron beam interacting within a high-Z conversion target. PEPPo demonstrated the effective transfer of spin-polarization of an 8.2 MeV/c polarized (P~85%) electron beam to positrons produced in varying thickness tungsten production targets, and collected and measured in the range of 3.1 to 6.2 MeV/c. In comparison to other methods this technique reveals a new pathway for producing either high-energy or thermal polarized positron beams using a relatively low polarized electron beam energy (~10MeV) .This presentation will describe the PEPPo concept, the motivations of the experiment and high positron polarization achieved.

  10. Electron-beam induced synthesis of nanostructures: a review.

    PubMed

    Gonzalez-Martinez, I G; Bachmatiuk, A; Bezugly, V; Kunstmann, J; Gemming, T; Liu, Z; Cuniberti, G; Rümmeli, M H

    2016-06-01

    As the success of nanostructures grows in modern society so does the importance of our ability to control their synthesis in precise manners, often with atomic precision as this can directly affect the final properties of the nanostructures. Hence it is crucial to have both deep insight, ideally with real-time temporal resolution, and precise control during the fabrication of nanomaterials. Transmission electron microscopy offers these attributes potentially providing atomic resolution with near real time temporal resolution. In addition, one can fabricate nanostructures in situ in a TEM. This can be achieved with the use of environmental electron microscopes and/or specialized specimen holders. A rather simpler and rapidly growing approach is to take advantage of the imaging electron beam as a tool for in situ reactions. This is possible because there is a wealth of electron specimen interactions, which, when implemented under controlled conditions, enable different approaches to fabricate nanostructures. Moreover, when using the electron beam to drive reactions no specialized specimen holders or peripheral equipment is required. This review is dedicated to explore the body of work available on electron-beam induced synthesis techniques with in situ capabilities. Particular emphasis is placed on the electron beam-induced synthesis of nanostructures conducted inside a TEM, viz. the e-beam is the sole (or primary) agent triggering and driving the synthesis process. PMID:27211080

  11. Attainment of Electron Beam Suitable for Medium Energy Electron Cooling

    SciTech Connect

    Seletskiy, Sergei M.

    2005-01-01

    Electron cooling of charged particle beams is a well-established technique at electron energies of up to 300 keV. However, up to the present time the advance of electron cooling to the MeV-range energies has remained a purely theoretical possibility. The electron cooling project at Fermilab has recently demonstrated the ¯rst cooling of 8.9 GeV/c antiprotons in the Recycler ring, and therefore, has proved the validity of the idea of relativistic electron cool- ing. The Recycler Electron Cooler (REC) is the key component of the Teva- tron Run II luminosity upgrade project. Its performance depends critically on the quality of electron beam. A stable electron beam of 4.3 MeV car- rying 0.5 A of DC current is required. The beam suitable for the Recycler Electron Cooler must have an angular spread not exceeding 200 ¹rad. The full-scale prototype of the REC was designed, built and tested at Fermilab in the Wideband laboratory to study the feasibility of attaining the high-quality electron beam. In this thesis I describe various aspects of development of the Fermilab electron cooling system, and the techniques used to obtain the electron beam suitable for the cooling process. In particular I emphasize those aspects of the work for which I was principally responsible.

  12. Current understanding and issues on electron beam injection in space

    NASA Technical Reports Server (NTRS)

    Papadopoulos, K.; Szuszczewicz, E. P.

    1988-01-01

    The status of the physics understanding involved in electron beam injection in space is reviewed. The paper examines our understanding of beam plasma interactions and their associated wave and energized particle spectra of the processes involved in the beam plasma discharge, and of the vehicle charge neutralization. 'Strawman' models are presented for comparison with experimental observations.

  13. RADLAC II high current electron beam propagation experiment

    SciTech Connect

    Frost, C.A.; Shope, S.L.; Mazarakis, M.G.; Poukey, J.W.; Wagner, J.S.; Turman, B.N.; Crist, C.E.; Welch, D.R.; Struve, K.W.

    1992-08-01

    This resistive hose instability of an electron beam was observed to be convective in recent RADLAC II experiments for higher current shots. The effects of air scattering for these shots were minimal. These experiments and theory suggest low-frequency hose motion which does not appear convective may be due to rapid expansion and subsequent drifting of the beam nose.

  14. Energy measurement of electron beams by Compton scattering

    NASA Technical Reports Server (NTRS)

    Keppel, Cynthia

    1995-01-01

    A method has been proposed to utilize the well-known Compton scattering process as a tool to measure the centroid energy of a high energy electron beam at the 0.01% level. It is suggested to use the Compton scattering of an infrared laser off the electron beam, and then to measure the energy of the scattered gamma-rays very precisely using solid-state detectors. The technique proposed is applicable for electron beams with energies from 200 MeV to 16 GeV using presently available lasers. This technique was judged to be the most viable of all those proposed for beam energy measurements at the nearby Continuous Electron Beam Accelerator Facility (CEBAF). Plans for a prototype test of the technique are underway, where the main issues are the possible photon backgrounds associated with an electron accelerator and the electron and laser beam stabilities and diagnostics. The bulk of my ASEE summer research has been spent utilizing the expertise of the staff at the Aerospace Electronics Systems Division at LaRC to assist in the design of the test. Investigations were made regarding window and mirror transmission and radiation damage issues, remote movement of elements in ultra-high vacuum conditions, etc. The prototype test of the proposed laser backscattering method is planned for this December.

  15. Electron beam irradiation of gemstone for color enhancement

    SciTech Connect

    Idris, Sarada; Ghazali, Zulkafli; Hashim, Siti A'iasah; Ahmad, Shamshad; Jusoh, Mohd Suhaimi

    2012-09-26

    Numerous treatment of gemstones has been going on for hundreds of years for enhancing color and clarity of gems devoid of these attributes. Whereas previous practices included fraudulent or otherwise processes to achieve the color enhancement, the ionizing radiation has proven to be a reliable and reproducible technique. Three types of irradiation processes include exposure to gamma radiation, electron beam irradiation and the nuclear power plants. Electron Beam Irradiation of Gemstone is a technique in which a gemstone is exposed to highly ionizing radiation electron beam to knock off electrons to generate color centers culminating in introduction of deeper colors. The color centers may be stable or unstable. Below 9MeV, normally no radioactivity is introduced in the exposed gems. A study was conducted at Electron Beam Irradiation Centre (Alurtron) for gemstone color enhancement by using different kind of precious gemstones obtained from Pakistan. The study shows that EB irradiation not only enhances the color but can also improves the clarity of some type of gemstones. The treated stones included kunzite, tourmaline, topaz, quartz, aquamarine and cultured pearls. Doses ranging from 25 kGy to 200 KGy were employed to assess the influence of doses on color and clarity and to select the optimum doses. The samples used included both the natural and the faceted gemstones. It is concluded that significant revenue generation is associated with the enhancement of the color in clarity of gemstones which are available at very cheap price in the world market.

  16. Metastable atom probe for measuring electron beam density profiles

    NASA Technical Reports Server (NTRS)

    Lockhart, J. M.; Zorn, J. C.

    1972-01-01

    Metastable atom probe was developed for measuring current density in electron beam as function of two arbitrary coordinates, with spatial resolution better than 0.5 mm. Probe shows effects of space charge, magnetic fields, and other factors which influence electron current density, but operates with such low beam densities that introduced perturbation is very small.

  17. Flat-Lens Focusing of Electron Beams in Graphene

    PubMed Central

    Tang, Yang; Cao, Xiyuan; Guo, Ran; Zhang, Yanyan; Che, Zhiyuan; Yannick, Fouodji T.; Zhang, Weiping; Du, Junjie

    2016-01-01

    Coupling electron beams carrying information into electronic units is fundamental in microelectronics. This requires precision manipulation of electron beams through a coupler with a good focusing ability. In graphene, the focusing of wide electron beams has been successfully demonstrated by a circular p-n junction. However, it is not favorable for information coupling since the focal length is so small that the focal spot locates inside the circular gated region, rather than in the background region. Here, we demonstrate that an array of gate-defined quantum dots, which has gradually changing lattice spacing in the direction transverse to propagation, can focus electrons outside itself, providing a possibility to make a coupler in graphene. The focusing effect can be understood as due to the gradient change of effective refractive indices, which are defined by the local energy band in a periodic potential. The strong focusing can be achieved by suitably choosing the lattice gradient and the layer number in the incident direction, offering an effective solution to precision manipulation of electron beams with wide electron energy range and high angular tolerance. PMID:27628099

  18. Vortex stabilized electron beam compressed fusion grade plasma

    SciTech Connect

    Hershcovitch, Ady

    2014-03-19

    Most inertial confinement fusion schemes are comprised of highly compressed dense plasmas. Those schemes involve short, extremely high power, short pulses of beams (lasers, particles) applied to lower density plasmas or solid pellets. An alternative approach could be to shoot an intense electron beam through very dense, atmospheric pressure, vortex stabilized plasma.

  19. Gamma and electron-beam irradiation of cut flowers

    NASA Astrophysics Data System (ADS)

    Kikuchi, Olivia Kimiko

    2003-01-01

    Fresh cut flowers are commodities that require quarantine treatment for export/import. In the present work some cut flowers were irradiated in a gamma panoramic source and in an electron beam accelerator with doses up to 800 Gy, and the results for the radiation tolerance of the flowers are presented.

  20. Energy Spread Reduction of Electron Beams Produced via Laser Wake

    SciTech Connect

    Pollock, Bradley Bolt

    2012-01-01

    Laser wakefield acceleration of electrons holds great promise for producing ultra-compact stages of GeV scale, high quality electron beams for applications such as x-ray free electron lasers and high energy colliders. Ultra-high intensity laser pulses can be self-guided by relativistic plasma waves over tens of vacuum diffraction lengths, to give >1 GeV energy in cm-scale low density plasma using ionization-induced injection to inject charge into the wake at low densities. This thesis describes a series of experiments which investigates the physics of LWFA in the self-guided blowout regime. Beginning with high density gas jet experiments the scaling of the LWFA-produced electron beam energy with plasma electron density is found to be in excellent agreement with both phenomenological theory and with 3-D PIC simulations. It is also determined that self-trapping of background electrons into the wake exhibits a threshold as a function of the electron density, and at the densities required to produce electron beams with energies exceeding 1 GeV a different mechanism is required to trap charge into low density wakes. By introducing small concentrations of high-Z gas to the nominal He background the ionization-induced injection mechanism is enabled. Electron trapping is observed at densities as low as 1.3 x 1018 cm-3 in a gas cell target, and 1.45 GeV electrons are demonstrated for the first time from LWFA. This is currently the highest electron energy ever produced from LWFA. The ionization-induced trapping mechanism is also shown to generate quasi-continuous electron beam energies, which is undesirable for accelerator applications. By limiting the region over which ionization-induced trapping occurs, the energy spread of the electron beams can be controlled. The development of a novel two-stage gas cell target provides the capability to tailor the gas composition in the longitudinal direction, and confine the trapping process to occur only in a

  1. Curing Composite Materials Using Lower-Energy Electron Beams

    NASA Technical Reports Server (NTRS)

    Byrne, Catherine A.; Bykanov, Alexander

    2004-01-01

    In an improved method of fabricating composite-material structures by laying up prepreg tapes (tapes of fiber reinforcement impregnated by uncured matrix materials) and then curing them, one cures the layups by use of beams of electrons having kinetic energies in the range of 200 to 300 keV. In contrast, in a prior method, one used electron beams characterized by kinetic energies up to 20 MeV. The improved method was first suggested by an Italian group in 1993, but had not been demonstrated until recently. With respect to both the prior method and the present improved method, the impetus for the use of electron- beam curing is a desire to avoid the high costs of autoclaves large enough to effect thermal curing of large composite-material structures. Unfortunately, in the prior method, the advantages of electron-beam curing are offset by the need for special walls and ceilings on curing chambers to shield personnel from x rays generated by impacts of energetic electrons. These shields must be thick [typically 2 to 3 ft (about 0.6 to 0.9 m) if made of concrete] and are therefore expensive. They also make it difficult to bring large structures into and out of the curing chambers. Currently, all major companies that fabricate composite-material spacecraft and aircraft structures form their layups by use of automated tape placement (ATP) machines. In the present improved method, an electron-beam gun is attached to an ATP head and used to irradiate the tape as it is pressed onto the workpiece. The electron kinetic energy between 200 and 300 keV is sufficient for penetration of the ply being laid plus one or two of the plies underneath it. Provided that the electron-beam gun is properly positioned, it is possible to administer the required electron dose and, at the same time, to protect personnel with less shielding than is needed in the prior method. Adequate shielding can be provided by concrete walls 6 ft (approximately equal to 1.8 m) high and 16 in. (approximately

  2. Lattice Strain Defects in a Ceria Nanolayer

    PubMed Central

    2016-01-01

    An ultrathin two-dimensional CeO2 (ceria) phase on a Cu(110) surface has been fabricated and fully characterized by high-resolution scanning tunneling microscopy, photoelectron spectroscopy, and density functional theory. The atomic lattice structure of the ceria/Cu(110) system is revealed as a hexagonal CeO2(111)-type monolayer separated from the Cu(110) surface by a partly disordered Cu–O intercalated buffer layer. The epitaxial coupling of the two-dimensional ceria overlayer to the Cu(110)-O surface leads to a nanoscopic stripe pattern, which creates defect regions of quasi-periodic lattice distortions. The symmetry and lattice mismatch at the interface is clarified to be responsible for the topographic stripe geometry and the related anisotropic strain defect regions at the ceria surface. This ceria monolayer is in a fully oxidized and thermodynamically stable state. PMID:26988695

  3. Growth mechanism of thin films of yttria-stabilized zirconia by chemical vapor infiltration using NiO-ceria substrate as oxygen source

    NASA Astrophysics Data System (ADS)

    Kikuchi, Kenji; Okada, Koji; Mineshige, Atsushi

    The deposition of yttria-stabilized zirconia films on a NiO-ceria substrate by chemical vapor infiltration (CVI) using ZrCl 4 and YCl 3 as metal sources and NiO-ceria as oxygen source was studied. The resultant films were cubic YSZ with a Y 2O 3 content of 3.7-4.2 mol%, and were transparent and strong. A NiO content of NiO-ceria above 60 mol% increases the growth rate of the YSZ film from about 5 to 25 μm over 2 h, indicating that chemical vapor deposition (CVD) occurred in addition to electrochemical vapor deposition (EVD), whereas NiO contents below 60 mol% does not affect the growth rate, indicating that only electrochemical vapor deposition occurred. The growth mechanism of the YSZ film is determined and a YSZ thin film is successfully fabricated on NiO-ceria to improve mechanical strength.

  4. Research on pinching characteristics of electron beams emitted from different cathode surfaces of a rod-pinch diode

    SciTech Connect

    Gao Yi; Qiu Aici; Zhang Zhong; Zhang Pengfei; Wang Zhiguo; Yang Hailiang

    2010-07-15

    The particle-in-cell code UNIPIC is used to simulate the working process of a rod-pinch diode and investigate the pinching characteristics of electron beams emitted from different cathode surfaces. The simulation results indicate that the electron beam emitted from the upstream surface pinches better than from other surfaces when all the three surfaces emit electrons. The charge-density deposition on the anode surface peaks at the rod tip while the deposited charge density is approximately uniform over the first 15 mm of the rod before rapidly increasing over the last 3 mm, indicating a large axial extent of electron deposition. For the case of single-surface emission, the pinching quality of the electron beam emitted from the downstream surface is better than those from other surfaces. The charge-density deposition peaks at the rod tip and decreases rapidly off the tip. Based on the relationship of Larmor radius, beam's self-magnetic field, and the spatial current distribution, the above simulation results are analyzed theoretically. The experiments are performed on the inductive voltage adder to examine the simulations. By comparing the axial distribution of the radiation on the anode rod measured with the pinhole camera and the on-axis forward x-ray dose measured with the LiF thermoluminescent detectors, the simulation results are verified. The electron emission suppression method and the impedance change for each case are investigated or discussed in this paper.

  5. Research on pinching characteristics of electron beams emitted from different cathode surfaces of a rod-pinch diode

    NASA Astrophysics Data System (ADS)

    Gao, Yi; Qiu, Aici; Zhang, Zhong; Zhang, Pengfei; Wang, Zhiguo; Yang, Hailiang

    2010-07-01

    The particle-in-cell code UNIPIC is used to simulate the working process of a rod-pinch diode and investigate the pinching characteristics of electron beams emitted from different cathode surfaces. The simulation results indicate that the electron beam emitted from the upstream surface pinches better than from other surfaces when all the three surfaces emit electrons. The charge-density deposition on the anode surface peaks at the rod tip while the deposited charge density is approximately uniform over the first 15 mm of the rod before rapidly increasing over the last 3 mm, indicating a large axial extent of electron deposition. For the case of single-surface emission, the pinching quality of the electron beam emitted from the downstream surface is better than those from other surfaces. The charge-density deposition peaks at the rod tip and decreases rapidly off the tip. Based on the relationship of Larmor radius, beam's self-magnetic field, and the spatial current distribution, the above simulation results are analyzed theoretically. The experiments are performed on the inductive voltage adder to examine the simulations. By comparing the axial distribution of the radiation on the anode rod measured with the pinhole camera and the on-axis forward x-ray dose measured with the LiF thermoluminescent detectors, the simulation results are verified. The electron emission suppression method and the impedance change for each case are investigated or discussed in this paper.

  6. Efficient Ceria-Platinum Inverse Catalyst for Partial Oxidation of Methanol.

    PubMed

    Ostroverkh, Anna; Johánek, Viktor; Kúš, Peter; Šedivá, Romana; Matolín, Vladimír

    2016-06-28

    Ceria-platinum-based bilayered thin films deposited by magnetron sputtering were developed and tested in regard to their catalytic activity for methanol oxidation by employing a temperature-programmed reaction (TPR) technique. The composition and structure of the samples were characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Both conventional (oxide-supported metal nanoparticles [NPs]) and inverse configurations (metal with oxide overlayer) were analyzed to uncover the structural dependence of activity and selectivity of these catalysts with respect to different pathways of methanol oxidation. We clearly demonstrate that the amount of cerium oxide (ceria) loading has a profound influence on methanol oxidation reaction characteristics. Adding a noncontinuous adlayer of ceria greatly enhances the catalytic performance of platinum (Pt) in favor of partial oxidation of methanol (POM), gaining an order of magnitude in the absolute yield of hydrogen. Moreover, the undesired by-production of carbon monoxide (CO) is strongly suppressed, making the ceria-platinum inverse catalyst a great candidate for clean hydrogen production. It is suggested that the methanol oxidation process is facilitated by the synergistic effect between both components of the inverse catalyst (involving oxygen from ceria and providing a reaction site on the adjacent Pt surface) as well as by the fact that the ability of ceria to exchange oxygen (i.e., to alter the oxidation state of Ce between 3+ and 4+) during the reaction is inversely proportional to its thickness. The increased redox capability of the discontinuous ceria adlayer shifts the preferred reaction pathway from dehydrogenation of hydroxymethyl intermediate to CO in favor of its oxidation to formate. PMID:27254727

  7. Electron Beam-Target Interaction and Spot Size Stabilization in Flash X-Ray Radiography*

    NASA Astrophysics Data System (ADS)

    Kwan, Thomas J. T.

    1999-11-01

    focusing. The negative bias can be created by inductively isolating the target, by an external voltage source, or most simply by using charge deposition from the electron beam itself to resistively bias the target. An alternative approach utilizes a very thin upstream barrier foil that is transparent to the incoming electron beam but opaque to the lower-velocity ions. Simulations indicate that any of these methods can effectively stabilize the beam spot size. The self-biasing target concept was implemented and tested on the ITS machine and performed as predicted. Computer simulations and data from these experiments allowed us to predict the time scale for ion emission and identify the ion species present. Another key factor is the influence of beam pinch and emittance growth on the radiative output. Results from our beam transport calculations have been linked to a Monte Carlo code to analyze the quantitative impact on the x-ray output spectrum. The presentation will focus on the physics of converter targets and on designs applicable to the DARHT radiographic facility.

  8. Nanocrystalline biphasic resorbable calcium phosphate (HAp/β-TCP) thin film prepared by electron beam evaporation technique

    NASA Astrophysics Data System (ADS)

    Elayaraja, K.; Chandra, V. Sarath; Joshy, M. I. Ahymah; Suganthi, R. V.; Asokan, K.; Kalkura, S. Narayana

    2013-06-01

    Biphasic calcium phosphate (BCP) thin film having resorbable β-tricalcium phosphate (β-TCP) and non-resorbable hydroxyapatite (HAp) phases having enhanced bioactivity was synthesized by electron beam evaporation technique. Nanosized BCP was deposited as a layer (500 nm) on (0 0 1) silicon substrate by electron beam evaporation and crystalline phase of samples were found to improve on annealing at 700 °C. Uniform deposition of calcium phosphate on silicon substrate was verified from elemental mapping using scanning electron microscope (SEM-EDX). Annealing of the samples led to a decrease in surface roughness, hydrophobicity and dissolution of the coating layer. Amoxicillin loaded thin films exhibited significant bacterial resistance. In addition, BCP thin films did not exhibit any cytotoxicity. Antibiotics incorporated BCP coated implants might prevent the post-surgical infections and could promote bone-bonding of orthopedic devices.

  9. Using an energized oxygen micro-jet for improved graphene etching by focused electron beam

    SciTech Connect

    Kim, Songkil; Henry, Mathias; Fedorov, Andrei G.

    2015-12-07

    We report on an improved Focused Electron Beam Induced Etching (FEBIE) process, which exploits heated oxygen delivery via a continuous supersonic micro-jet resulting in faster graphene patterning and better etch feature definition. Positioning a micro-jet in close proximity to a graphene surface with minimal jet spreading due to a continuous regime of gas flow at the exit of the 10 micrometer inner diameter capillary allows for focused exposure of the surface to reactive oxygen at high mass flux and impingement energy of a supersonic gas stream localized to a small etching area exposed to electron beam. These unique benefits of focused supersonic oxygen delivery to the surface enable a dramatic increase in the etch rate of graphene with no parasitic carbon ‘halo’ deposition due to secondary electrons (SE) from backscattered electrons (BSE) in the area surrounding the etched regions. Increase of jet temperature via local nozzle heating provides means for enhancing kinetic energy of impinging oxygen molecules, which further speed up the etch, thus minimizing the beam exposure time and required electron dose, before parasitic carbon film deposition due to BSE mediated decomposition of adsorbed hydrocarbon contaminants has a measurable impact on quality of graphene etched features. Interplay of different physical mechanisms underlying an oxygen micro-jet assisted FEBIE process is discussed with support from experimental observations.

  10. Using an energized oxygen micro-jet for improved graphene etching by focused electron beam

    DOE PAGESBeta

    Kim, Songkil; Henry, Mathias; Fedorov, Andrei G.

    2015-12-07

    We report on an improved Focused Electron Beam Induced Etching (FEBIE) process, which exploits heated oxygen delivery via a continuous supersonic micro-jet resulting in faster graphene patterning and better etch feature definition. Positioning a micro-jet in close proximity to a graphene surface with minimal jet spreading due to a continuous regime of gas flow at the exit of the 10 micrometer inner diameter capillary allows for focused exposure of the surface to reactive oxygen at high mass flux and impingement energy of a supersonic gas stream localized to a small etching area exposed to electron beam. These unique benefits ofmore » focused supersonic oxygen delivery to the surface enable a dramatic increase in the etch rate of graphene with no parasitic carbon ‘halo’ deposition due to secondary electrons (SE) from backscattered electrons (BSE) in the area surrounding the etched regions. Increase of jet temperature via local nozzle heating provides means for enhancing kinetic energy of impinging oxygen molecules, which further speed up the etch, thus minimizing the beam exposure time and required electron dose, before parasitic carbon film deposition due to BSE mediated decomposition of adsorbed hydrocarbon contaminants has a measurable impact on quality of graphene etched features. Interplay of different physical mechanisms underlying an oxygen micro-jet assisted FEBIE process is discussed with support from experimental observations.« less

  11. Using an energized oxygen micro-jet for improved graphene etching by focused electron beam

    NASA Astrophysics Data System (ADS)

    Kim, Songkil; Henry, Mathias; Fedorov, Andrei G.

    2015-12-01

    We report on an improved Focused Electron Beam Induced Etching (FEBIE) process, which exploits heated oxygen delivery via a continuous supersonic micro-jet resulting in faster graphene patterning and better etch feature definition. Positioning a micro-jet in close proximity to a graphene surface with minimal jet spreading due to a continuous regime of gas flow at the exit of the 10 μm inner diameter capillary allows for focused exposure of the surface to reactive oxygen at high mass flux and impingement energy of a supersonic gas stream localized to a small etching area exposed to electron beam. These unique benefits of focused supersonic oxygen delivery to the surface enable a dramatic increase in the etch rate of graphene with no parasitic carbon "halo" deposition due to secondary electrons from backscattered electrons (BSE) in the area surrounding the etched regions. Increase of jet temperature via local nozzle heating provides means for enhancing kinetic energy of impinging oxygen molecules, which further speed up the etch, thus minimizing the beam exposure time and required electron dose, before parasitic carbon film deposition due to BSE mediated decomposition of adsorbed hydrocarbon contaminants has a measurable impact on quality of graphene etched features. Interplay of different physical mechanisms underlying an oxygen micro-jet assisted FEBIE process is discussed with support from experimental observations.

  12. Using an energized oxygen micro-jet for improved graphene etching by focused electron beam

    SciTech Connect

    Kim, Songkil; Henry, Mathias; Fedorov, Andrei G.

    2015-12-07

    We report on an improved Focused Electron Beam Induced Etching (FEBIE) process, which exploits heated oxygen delivery via a continuous supersonic micro-jet resulting in faster graphene patterning and better etch feature definition. Positioning a micro-jet in close proximity to a graphene surface with minimal jet spreading due to a continuous regime of gas flow at the exit of the 10 μm inner diameter capillary allows for focused exposure of the surface to reactive oxygen at high mass flux and impingement energy of a supersonic gas stream localized to a small etching area exposed to electron beam. These unique benefits of focused supersonic oxygen delivery to the surface enable a dramatic increase in the etch rate of graphene with no parasitic carbon “halo” deposition due to secondary electrons from backscattered electrons (BSE) in the area surrounding the etched regions. Increase of jet temperature via local nozzle heating provides means for enhancing kinetic energy of impinging oxygen molecules, which further speed up the etch, thus minimizing the beam exposure time and required electron dose, before parasitic carbon film deposition due to BSE mediated decomposition of adsorbed hydrocarbon contaminants has a measurable impact on quality of graphene etched features. Interplay of different physical mechanisms underlying an oxygen micro-jet assisted FEBIE process is discussed with support from experimental observations.

  13. Synthesis and atomic level in situ redox characterization in ceria and ceria zirconia

    NASA Astrophysics Data System (ADS)

    Wang, Ruigang

    2007-12-01

    Nanocrystalline ceria-based oxides are widely used in automotive three-way catalytic converters to reduce the emissions of carbon monoxide, nitrogen oxides, and unburned hydrocarbons. The primary function of ceria-based oxides in the catalytic process is to adjust the local oxygen partial pressure and maintain an air-to-fuel ratio near the stoichiometric value (˜14.5) required for the optimal catalyst performance for carbon monoxide, hydrocarbon oxidation, and nitrogen oxides reduction. In this dissertation, a study of the relationship between the nanoscale structure, chemistry, and the redox behavior on high surface area ceria and ceria zirconia is presented. Precipitation and spray freezing methods were used to synthesize nanocrystalline ceria and ceria zirconia solid solution powders respectively. The effect of thermal treatments in oxidizing and reducing atmospheres on the reducibility of the materials has been systematically investigated. X-ray diffraction and thermogravimetric analysis were used to characterize the average structure and reducibility. In situ environmental transmission electron microscope was exploited to visualize the dynamic changes during redox processes at the atomic level. This resulted in the identification of the nanoscale structure and chemistry for the most active nanoparticles in these oxides. The correlation between ex situ macroscopic redox properties and in situ redox behavior of individual nanoparticles is demonstrated. The addition of zirconia to ceria clearly enhances the reducibility and thermal stability of ceria. A fundamental difference between ceria and ceria zirconia during in situ redox processes is related to oxygen vacancy ordering. Ceria showed oxygen vacancy ordering during reduction, whereas ceria zirconia did not. It is suggested that the absence of oxygen vacancy ordering might be a fundamental factor for improved redox properties of ceria zirconia compared with pure ceria. The 50% ceria-50% zirconia solid

  14. Unique Electronic and Structural Effects in Vanadia/Ceria-Catalyzed Reactions.

    PubMed

    Wu, Xin-Ping; Gong, Xue-Qing

    2015-10-21

    Vanadia/ceria supported catalysts exhibit ultrahigh catalytic activities in oxidative dehydrogenation (ODH) reactions. Here, we performed systematic density functional theory calculations to illustrate the underlying mechanisms. It is found that unique electronic and structural effects are both crucial in the catalytic processes. Calculations of the catalytic performance of different oxygen species in oxidation of methanol to formaldehyde suggested that the oxygen of the interface V-O-Ce group is catalytically more active, especially when H adsorption energy is small, indicating the strong structural effect in the vanadia/ceria supported catalyst. In addition, new empty localized states of O 2p generated in a ceria-supported system through depositing VO3- and VO4-type monomeric vanadia species are determined to participate in the whole ODH reaction processes and help to reduce the barriers at various steps. PMID:26440141

  15. Ceria nanoclusters on graphene/Ru(0001): A new model catalyst system

    NASA Astrophysics Data System (ADS)

    Novotny, Z.; Netzer, F. P.; Dohnálek, Z.

    2016-10-01

    The growth of ceria nanoclusters on single-layer graphene on Ru(0001) has been examined, with a view towards fabricating a stable system for model catalysis studies. The surface morphology and cluster distribution as a function of oxide coverage and substrate temperature has been monitored by scanning tunneling microscopy (STM), whereas the chemical composition of the cluster deposits has been determined by Auger electron spectroscopy (AES). The ceria nanoparticles are of the CeO2(111)-type and are anchored at the intrinsic defects of the graphene surface, resulting in a variation of the cluster densities across the macroscopic sample surface. The ceria clusters on graphene display a remarkable stability against reduction in ultrahigh vacuum up to 900 K, but some sintering of clusters is observed for temperatures > 450 K. The evolution of the cluster size distribution suggests that the sintering proceeds via a Smoluchowski ripening mechanism, i.e. diffusion and aggregation of entire clusters.

  16. A Investigation of Crystal Surface Structure and Electron Beam-Induced Interaction by Srem.

    NASA Astrophysics Data System (ADS)

    Ou, Herng-Jia Henry

    Scanning Reflection Electron Microscopy (SREM) has recently become an effective technique for surface science study. Nanodiffraction patterns are used to characterize the local surface structure of a region as small as the resolution limit of SREM image. Two instrumentation developments were attempted: (1) Reflection Electron Microscopy and Electron Reflection Diffraction at Intermediate Energy (REMEDIE) microscope system, and (2) In-situ specimen treatment chamber of VG-HB5 STEM microscope. Two different individual experiments were carried out, one in each microscope: (1) investigations of Si(111)2 x 1 domain structure of an in -situ cleaved crystal surface in the REMEDIE system, and (2) investigations of electron beam-induced interaction between the in-situ deposited small metallic particles and MgO crystal surface in VG-HG5 microscope. Alternative arrangements of Si(111)2 x 1 B domain structure, C domain structure and the regular 1x1 structure region were observed, suggesting a bonding relationship between them. On the (100) MgO surface, the as-deposited Cu particles prefer to align on 001 , the incident beam direction, and/or decorate the big surface steps. But after exposure to air, these Cu particles appear randomly, decorating the fine surface steps. At room temperature and T(,s) = 90(DEGREES)C, as-deposited Pd particles decorate the MgO surface in the same way as Cu particles do. At T(,s) = 150(DEGREES)C, the electron beam-induced growth process of the epitaxed Pd particles on the crystal surface steps is observed, a core of particles is formed, and the extension of the growth process is guided by the condensed electron beam. Pd particles of 10(ANGSTROM) in diameter were observed during the growth process. At T(,s) = 250(DEGREES)C, the periodic surface fringe decorated by the as-deposited Pd particles show (TURN)25(ANGSTROM) periodicity, presumably associated with the surface structure of the substrate. SREM images of the periodic arrays of surface steps on

  17. Application of electron beam plasma for biopolymers modification

    NASA Astrophysics Data System (ADS)

    Vasilieva, T. M.

    2012-06-01

    The effects of the Electron Beam Plasma treatment on natural polysaccharide chitosan were studied experimentally. Low molecular water-soluble products of chitosan and chitooligosaccharides were obtained by treating the original polymers in the Electron Beam Plasma of oxygen and water vapor. The molecular mass of the products varied from 18 kDa to monomeric fragments. The degradation of the original polymers was due to the action of active oxygen particles (atomic and singlet oxygen) and the particles of the water plasmolysis (hydroxyl radicals, hydrogen peroxides). The 95% yield of low molecular weight chitosans was attained by optimizing the treatment conditions. The studies of the antimicrobial activity of low molecular products showed that they strongly inhibit the multiplication of colon bacillus, aurococcus and yeast-like fungi. The EBP-stimulated degradation of polysaccharides and proteins were found to result from breaking β-1,4 glycosidic bounds and peptide bonds, respectively.

  18. Characterization of 2219 Aluminum Produced by Electron Beam Freeform Fabrication

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M. B.; Hafley, Robert A.

    2002-01-01

    Researchers at NASA Langley Research Center are developing a new electron beam freeform fabrication (EB F(sup 3)) technique to fabricate metal parts. This process introduces metal wire into a molten pool created by a focused electron beam. Potential aerospace applications for this technology include ground-based fabrication of airframe structures and on-orbit construction and repair of space components and structures. Processing windows for reliably producing high quality 2219 aluminum parts using the EB F(sup 3) technique are being defined. The effects of translation speed, wire feed rate, and beam power on the resulting microstructures and mechanical properties are explored. Tensile properties (ultimate tensile strength, yield strength, and elongation) show little effect over the range of processing conditions tested. Basic processing-microstructure-property correlations are drawn for the EB F(sup 3) process.

  19. Resistive collimation of electron beams in relativistic and degenerate plasma

    NASA Astrophysics Data System (ADS)

    Mahdavi, M.; Khodadadi Azadboni, F.

    2014-09-01

    The purpose of this research is the study of the effects of plasma state and fiber on collimating relativistic electron beam in fast ignition. In this paper, for collimating relativistic electrons produced at the laser plasma interaction, a thin fiber of aluminum, lithium or CH either in the classical, degenerate or relativistic plasma states is considered. The fast electron beam could be collimated down to radii of 10 μm, in that case, the best results are achieved when there is a sharp transition in resistance. This ensures that the correct magnetic growth rate is used for hot electrons at different energy levels. Calculations show that the resistivity of the material surrounding the CH fiber in the degenerate plasma is smaller than that for classical and relativistic plasma.

  20. Measurement of microwave radiation from electron beam in the atmosphere

    NASA Astrophysics Data System (ADS)

    Ohta, I. S.; Akimune, H.; Fukushima, M.; Ikeda, D.; Inome, Y.; Matthews, J. N.; Ogio, S.; Sagawa, H.; Sako, T.; Shibata, T.; Yamamoto, T.

    2016-02-01

    We report the use of an electron light source (ELS) located at the Telescope Array Observatory in Utah, USA, to measure the isotropic microwave radiation from air showers. To simulate extensive air showers, the ELS emits an electron beam into the atmosphere and a parabola antenna system for the satellite communication is used to measure the microwave radiation from the electron beam. Based on this measurement, an upper limit on the intensity of a 12.5 GHz microwave radiation at 0.5 m from a 1018 eV air shower was estimated to be 3.96×10-16 W m-2 Hz-1 with a 95% confidence level.

  1. Electron beam treatment of exhaust gas with high NOx concentration

    NASA Astrophysics Data System (ADS)

    Licki, Janusz; Chmielewski, Andrzej G.; Pawelec, Andrzej; Zimek, Zbigniew; Witman, Sylwia

    2014-05-01

    Simulated exhaust gases with a high NOx concentration, ranging from 200 to 1700 ppmv, were irradiated by an electron beam from an accelerator. In the first part of this study, only exhaust gases were treated. Low NOx removal efficiencies were obtained for high NOx concentrations, even with high irradiation doses applied. In the second part of study, gaseous ammonia or/and vapor ethanol were added to the exhaust gas before its inlet to the plasma reactor. These additions significantly enhanced the NOx removal efficiency. The synergistic effect of high SO2 concentration on NOx removal was observed. The combination of electron beam treatment with the introduction of the above additions and with the performance of irradiation under optimal parameters ensured high NOx removal efficiency without the application of a solid-state catalyst.

  2. Toward a cold electron beam in the Fermilab's Electron Cooler

    SciTech Connect

    Vitali S. Tupikov et al.

    2004-05-12

    Fermilab is developing a high-energy electron cooling system to cool 8.9-GeV/c antiprotons in the Recycler ring [1]. Cooling of antiprotons requires a round electron beam with a small angular spread propagating through 20-m long cooling section with a kinetic energy of 4.3 MeV. To confine the electron beam tightly and to keep its transverse angles below 0.1 mrad, the cooling section will be immersed into a solenoidal field of 50-150G. This paper describes the technique of measuring and adjusting the magnetic field quality in the cooling section and presents preliminary results of beam quality measurements in the cooler prototype.

  3. Intense electron beam propagation across a magnetic field

    SciTech Connect

    Zhang, X.; Striffler, C.D.; Yao, R.L.; Destler, W.W.; Reiser, M.P.

    1989-01-01

    In this paper we consider the propagation of an intense electron-ion beam across an applied magnetic field. In the absence of the applied field, the beam system is in a Bennett equilibrium state that involves electrons with both large axial and thermal velocities and a cold stationary space-charge neutralizing ion species. Typical parameters under consideration are V{sub o} {approximately} 1 MV, I {approximately} 5 kA, T{sub e} {approximately} 100 keV, and beam radii {approximately} 1 cm. We find that in the intense beam regime, the propagation is limited due to space-charge depression caused by the deflection of the electron beam by the transverse field. This critical field is of the order of the peak self-magnetic field of the electron beam which is substantially higher than the single particle cut-off field. 8 refs., 3 figs.

  4. An EBIC equation for solar cells. [Electron Beam Induced Current

    NASA Technical Reports Server (NTRS)

    Luke, K. L.; Von Roos, O.

    1983-01-01

    When an electron beam of a scanning electron microscope (SEM) impinges on an N-P junction, the generation of electron-hole pairs by impact ionization causes a characteristic short circuit current I(sc) to flow. The I(sc), i.e., EBIC (electron beam induced current) depends strongly on the configuration used to investigate the cell's response. In this paper the case where the plane of the junction is perpendicular to the surface is considered. An EBIC equation amenable to numerical computations is derived as a function of cell thickness, source depth, surface recombination velocity, diffusion length, and distance of the junction to the beam-cell interaction point for a cell with an ohmic contact at its back surface. It is shown that the EBIC equation presented here is more general and easier to use than those previously reported. The effects of source depth, ohmic contact, and diffusion length on the normalized EBIC characteristic are discussed.

  5. Limiting current of intense electron beams in a decelerating gap

    NASA Astrophysics Data System (ADS)

    Nusinovich, G. S.; Beaudoin, B. L.; Thompson, C.; Karakkad, J. A.; Antonsen, T. M.

    2016-02-01

    For numerous applications, it is desirable to develop electron beam driven efficient sources of electromagnetic radiation that are capable of producing the required power at beam voltages as low as possible. This trend is limited by space charge effects that cause the reduction of electron kinetic energy and can lead to electron reflection. So far, this effect was analyzed for intense beams propagating in uniform metallic pipes. In the present study, the limiting currents of intense electron beams are analyzed for the case of beam propagation in the tubes with gaps. A general treatment is illustrated by an example evaluating the limiting current in a high-power, tunable 1-10 MHz inductive output tube (IOT), which is currently under development for ionospheric modification. Results of the analytical theory are compared to results of numerical simulations. The results obtained allow one to estimate the interaction efficiency of IOTs.

  6. Melt pool dynamics during selective electron beam melting

    NASA Astrophysics Data System (ADS)

    Scharowsky, T.; Osmanlic, F.; Singer, R. F.; Körner, C.

    2014-03-01

    Electron beam melting is a promising additive manufacturing technique for metal parts. Nevertheless, the process is still poorly understood making further investigations indispensable to allow a prediction of the part's quality. To improve the understanding of the process especially the beam powder interaction, process observation at the relevant time scale is necessary. Due to the difficult accessibility of the building area, the high temperatures, radiation and the very high scanning speeds during the melting process the observation requires an augmented effort in the observation equipment. A high speed camera in combination with an illumination laser, band pass filter and mirror system is suitable for the observation of the electron beam melting process. The equipment allows to observe the melting process with a high spatial and temporal resolution. In this paper the adjustment of the equipment and results of the lifetime and the oscillation frequencies of the melt pool for a simple geometry are presented.

  7. Validation experiments for LBM simulations of electron beam melting

    NASA Astrophysics Data System (ADS)

    Ammer, Regina; Rüde, Ulrich; Markl, Matthias; Jüchter, Vera; Körner, Carolin

    2014-05-01

    This paper validates three-dimensional (3D) simulation results of electron beam melting (EBM) processes by comparing experimental and numerical data. The physical setup is presented which is discretized by a 3D thermal lattice Boltzmann method (LBM). An experimental process window is used for the validation depending on the line energy injected into the metal powder bed and the scan velocity of the electron beam. In the process window, the EBM products are classified into the categories, porous, good and swelling, depending on the quality of the surface. The same parameter sets are used to generate a numerical process window. A comparison of numerical and experimental process windows shows a good agreement. This validates the EBM model and justifies simulations for future improvements of the EBM processes. In particular, numerical simulations can be used to explain future process window scenarios and find the best parameter set for a good surface quality and dense products.

  8. Fabrication of graphitic nanowire structure by electron beam lithography

    NASA Astrophysics Data System (ADS)

    Takai, Kazuyuki; Enoki, Toshiaki

    2007-12-01

    The graphitic nanowire structure was fabricated by local graphitization induced by direct electron-beam irradiation or the annealing treatment of wire-shaped nano-sized pattern, where glassy carbon film was used as the precursor materials. The direct irradiation of the 50 keV electron beam hardly causes the local graphitization of the sample, while the annealing of nanowire-patterned glassy carbon with 50 nm width successfully gives graphitic nanowire structure. The electrical conductivity of the fabricated nanowire structure shows metallic temperature dependence. However, the graphitic domain size of the wire was found to be very small (ca. 5 nm) by using Raman spectroscopy and the magnetoresistance. Higher temperature annealing is expected to improve the crystallinity of the graphitic nanowire.

  9. Decomposition of high concentration SF6 using an electron beam

    NASA Astrophysics Data System (ADS)

    Son, Youn-Suk; Lee, Sung-Joo; Choi, Chang Yong; Park, Jun-Hyeong; Kim, Tak-Hyun; Jung, In-Ha

    2016-07-01

    In this study, high concentration SF6 (2-10%) was decomposed using an electron beam irradiation. Various influential factors were investigated to improve the destruction and removal efficiency (DRE) of SF6. The initial concentrations of SF6, absorbed doses, SF6/H2 ratios and retention times were the main factors of concern. As a result, the DRE increased as the adsorbed dose and retention time increased. The DRE of SF6 also increased up to 20% approximately when H2 was added to the reaction mixture. On the other hand, the DRE of SF6 decreased as initial concentrations of SF6 increased. Finally, the main by-product formed from SF6 decomposition by the electron beam was HF.

  10. Low-Energy Electron Beam Direct Writing Equipment

    NASA Astrophysics Data System (ADS)

    Fuse, Takashi; Ando, Atsushi; Kotsugi, Tadashi; Kinoshita, Hidetoshi; Sugihara, Kazuyoshi

    2007-09-01

    We proposed an electron beam direct writing (EBDW) system capable of high throughput and maskless operation based on a novel concept of using both low-energy electron beam (EB) and character projection (CP) system. We fabricated an EB optical column of low-energy EBDW equipment and obtained a resist pattern. We also investigated the beam blur and line width roughness (LWR) of lines and spaces (L/S) formed on a resist to change various EB current densities and convergence half angles. The obtained results show that a Coulomb interaction effect markedly affects the beam blur in our EB optical column. Thus, we reduce the number of sources caused by LWR and developed photoresists to obtain small LWR L/S patterns for achieving a high throughput.

  11. Experimental Studying of Dust Particles Charging by Electron Beam

    SciTech Connect

    Gavrikov, A. V.; Fortov, V. E.; Petrov, O. F.; Vorona, N. A.; Vasiliev, M. N.

    2008-09-07

    The studying of the dusty plasma properties under electron beam action are of great interest because it gives the unique opportunities for experimental investigation of strongly coupled systems as well as for developing the new dusty plasma technologies of creating the new composite materials. Highly charged dust particle generates electrostatic field that can accelerate positive ions to high power. It gives the unique possibilities of using these macroparticles (for deeply ions implantation, as catalysts for increasing rate of reactions with the high energy barrier, in the new ionic engines etc.). Presented work deals with the experimental investigation of dust particles charging under direct influence of electron beam. On the basis of experimental data the average velocities of dust particles were obtained and the charge of macroparticle was estimated.

  12. C-shaped electron beams: design, experimental production and application

    NASA Astrophysics Data System (ADS)

    Mousley, M.; Thirunavukkarasu, G.; Babiker, M.; Yuan, J.

    2015-08-01

    The development of metamaterials operating at visible light wavelengths requires metamaterials to be produced with nanoscale structure over large areas. Improvements in the efficiency of electron beam lithography (EBL) could play an important role in accelerating this development. In this paper we show the production of a shaped probe for use in EBL. A phase structured electron wave containing vortices can be focused to produce a C-shaped cross section. Local spatial frequency analysis shows that both the gap and overall size of the C-shape can be easily controlled. We present the generation of such a C-shaped electron beam using a holographic binary amplitude diffraction mask. Thin AlF3 film is exposed to the C-shaped diffraction order and demonstrates the facile production of both a metallic C-shaped structure as well as the etching of a C-shaped hole.

  13. The tracking of interfaces in an electron-beam vaporizer

    SciTech Connect

    Westerberg, K.W.; McClelland, M.A.; Finlayson, B.A.

    1993-03-01

    A numerical analysis is made of the material and energy flow in an electron beam vaporizer. In this system the energy from an electron beam heats metal confined in a water-cooled crucible. Metal is vaporized from a liquid pool circulating in a shell of its own solid. A modified Galerkin finite element method is used to calculate the flow and temperature fields along with the interface locations. The mesh is parameterized with spines which stretch and pivot as the phase boundaries move. The discretized equations are arranged in an ``arrow`` matrix and solved using the Newton-Raphson method. Results are given for an experimental aluminum vaporizer. The effects of buoyancy and capillary driven flow are included along with the surface contributions of vapor thrust, latent heat, thermal radiation, and crucible contact resistance.

  14. Strongly turbulent stabilization of electron beam-plasma interactions

    NASA Technical Reports Server (NTRS)

    Freund, H. P.; Haber, I.; Palmadesso, P.; Papadopoulos, K.

    1980-01-01

    The stabilization of electron beam interactions due to strongly turbulent nonlinearities is studied analytically and numerically for a wide range of plasma parameters. A fluid mode coupling code is described in which the effects of electron and ion Landau damping and linear growth due to the energetic electron beam are included in a phenomenological manner. Stabilization of the instability is found to occur when the amplitudes of the unstable modes exceed the threshold of the oscillating two-stream instability. The coordinate space structure of the turbulent spectrum which results clearly shows that soliton-like structures are formed by this process. Phenomenological models of both the initial stabilization and the asymptotic states are developed. Scaling laws between the beam-plasma growth rate and the fluctuations in the fields and plasma density are found in both cases, and shown to be in good agreement with the results of the simulation.

  15. Use of an Electron Beam for Stochastic Cooling

    SciTech Connect

    Yaroslave Derbenev

    2007-09-10

    Microwave instability of an electron beam can be used for a multiple increase in the collective response for the perturbation caused by a particle of a co-moving ion beam, i.e. for enhancement of friction force in electron cooling method. The low scale (hundreds GHz and higher frequency range) space charge or FEL type instabilities can be produced (depending on conditions) by introducing an alternating magnetic fields along the electron beam path. Beams’ optics and noise conditioning for obtaining a maximal cooling effect and related limitations will be discussed. The method promises to increase by a few orders of magnitude the cooling rate for heavy particle beams with a large emittance for a wide energy range with respect to either electron and conventional stochastic cooling.

  16. Copper bromide vapour laser excited by an electron beam

    NASA Astrophysics Data System (ADS)

    Bokhan, P. A.; Gugin, P. P.; Zakrevskii, D. E.

    2016-09-01

    Lasing on self-terminating copper atom transitions is obtained for the first time by pumping the Ne – CuBr mixture by regular pulses and by a pulse train of low-energy electron beams formed in an 'open' discharge. In these regimes in a range of experimental conditions, a growth of power and radiation energy is demonstrated with an increase in the electron beam current and pulse repetition rate. In a double pulse excitation regime, the lasing energy is completely recovered in ~2.5 μs. In a central zone of the active element where CuBr molecules are totally dissociated, the specific lasing energy of ~44 μJ cm-3 is obtained at a physical efficiency of 8.5%.

  17. Effects of modulated electron beams and cavities on reditrons

    SciTech Connect

    Kwan, T.J.T.; Davis, H.A.; Fulton, R.D.; Sherwood, E.G.

    1988-01-01

    The virtual cathode, when formed in a cavity, can generate microwaves at different cavity modes depending on the geometry of the cavity. We found that the formation and the oscillation frequency of the virtual cathode in a reditron can be significantly influenced by cavity designs. The length of a cavity can play a role in frequency and mode selection. Our simulations showed that TM/sub 012/ and TM/sub 033/ were excited for cavity lengths of 15.0 cm and 22.5 cm, respectively. In addition to the cavity effects on reditrons, we discovered that highly modulated electron beams can be produced in reditrons. Full modulation (100/percent/) of the transmitted electron beam current has been confirmed in our simulations. We further showed that incorporation of an inverse diode configuration can achieve microwave production efficiency of 26/percent/. 11 refs., 8 figs.

  18. Developments in low energy electron beam machinery and processes

    NASA Astrophysics Data System (ADS)

    Nablo, S. V.; Chrusciel, J.; Cleghorn, D. A.; Rangwalla, I.

    2003-08-01

    The engineering and development of a new generation of low energy, high power electron beam equipment is presented. Operating voltages range from 80 to 125 kV at widths to 1.65 m. At 110 kV these systems deliver 1000 Mrad m min -1 at 110 kV. Equipment operating power levels and their impact on reducing equipment size and cost are reviewed. The advantages of electron curing at these reduced operating voltages are described. The principles of the electron beam fluidized bed process for the treatment of powders and particulates in high-speed pneumatic transport are discussed. Typical system performances for polymer dissociation and crosslinking, or for agroproduct disinfestation and disinfection are presented. A process for the sterilization of polymer food containers employing the injection of low energy electrons through the open mouth has been developed. Some of its sterilization capabilities for bottles up to 2 l capacity are described.

  19. Millimeter-wave generation with spiraling electron beams

    NASA Technical Reports Server (NTRS)

    Kulke, B.

    1971-01-01

    The feasibility of using the interaction between a thin, solid, spiraling electron beam of 10 to 20 kV energy and a microwave cavity to generate watts of CW millimeter-wave power was investigated. Experimental results are given for several prototype devices operating at 9.4 GHz and at 94 GHz. Power outputs of 5 W, and electronic efficiencies near 3%, were obtained at X band, and moderate gain was obtained at 94 GHz. The small-signal theory gives a good fit to the X-band data, and the device behavior at 94 GHz is as expected from the given beam characteristics. The performance is limited chiefly by the velocity spread in the spiraling electron beam, and once this can be brought under control, high-power generation of millimeter waves appears quite feasible with this type of device.

  20. Tomographic determination of the power distribution in electron beams

    DOEpatents

    Teruya, A.T.; Elmer, J.W.

    1996-12-10

    A tomographic technique for determining the power distribution of an electron beam using electron beam profile data acquired from a modified Faraday cup to create an image of the current density in high and low power beams is disclosed. A refractory metal disk with a number of radially extending slits is placed above a Faraday cup. The beam is swept in a circular pattern so that its path crosses each slit in a perpendicular manner, thus acquiring all the data needed for a reconstruction in one circular sweep. Also, a single computer is used to generate the signals actuating the sweep, to acquire that data, and to do the reconstruction, thus reducing the time and equipment necessary to complete the process. 4 figs.

  1. Shaping single walled nanotubes with an electron beam

    SciTech Connect

    Zobelli, A.; Gloter, A.; Colliex, C.; Ewels, C. P.

    2008-01-15

    We show that electron irradiation in a dedicated scanning transmission microscope can be used as a nano-electron-lithography technique allowing the controlled reshaping of single walled carbon and boron nitride nanotubes. The required irradiation conditions have been optimized on the basis of total knock-on cross sections calculated within density functional based methods. It is then possible to induce morphological modifications, such as a local change of the tube chirality, by sequentially removing several tens of atoms with a nanometrical spatial resolution. We show that electron beam heating effects are limited. Thus, electron beam induced vacancy migration and nucleation might be excluded. These irradiation techniques could open new opportunities for nanoengineering a large variety of nanostructured materials.

  2. Spodumene and garnet luminescence excited by subnanosecond electron beams

    NASA Astrophysics Data System (ADS)

    Baksht, E. Kh.; Burachenko, A. G.; Solomonov, V. I.; Tarasenko, V. F.

    2011-11-01

    Pulsed cathodoluminescence of spodumene and yttrium-aluminum garnet crystals activated by Mn2+ and Nd3+ ions, respectively, is investigated. The luminescence was excited upon crystal irradiation by electron beams with current densities of 35 and 100 A/cm2 and average electron energy of ˜ 50 keV for 0.1, 0.25, and 0.65 ns. It is demonstrated that the electron beam duration decreased to several tenth of a nanosecond does not lead to essential changes of the mechanisms of pulsed cathodoluminescence excitation and character of its spectrum, but in this case, the intensity of luminescence of the hole centers increases compared with the intracenter luminescence.

  3. Electron-beam driven relaxation oscillations in ferroelectric nanodisks

    SciTech Connect

    Ng, Nathaniel; Ahluwalia, Rajeev; Kumar, Ashok; Srolovitz, David J.; Chandra, Premala; Scott, James F.

    2015-10-12

    Using a combination of computational simulations, atomic-scale resolution imaging and phenomenological modelling, we examine the underlying mechanism for nanodomain restructuring in lead zirconate titanate nanodisks driven by electron beams. The observed subhertz nanodomain dynamics are identified with relaxation oscillations where the charging/discharging cycle time is determined by saturation of charge traps and nanodomain wall creep. These results are unusual in that they indicate very slow athermal dynamics in nanoscale systems, and possible applications of gated versions are discussed.

  4. Electron Beam Collimation for the Next Generation Light Source

    SciTech Connect

    Steier, C.; Emma, P.; Nishimura, H.; Papadopoulos, C.; Sannibale, F.

    2013-05-20

    The Next Generation Light Source will deliver high (MHz) repetition rate electron beams to an array of free electron lasers. Because of the significant average current in such a facility, effective beam collimation is extremely important to minimize radiation damage to undulators, prevent quenches of superconducting cavities, limit dose rates outside of the accelerator tunnel and prevent equipment damage. This paper describes the early conceptual design of a collimation system, as well as initial results of simulations to test its effectiveness.

  5. Self-effect in expanding electron beam plasma

    SciTech Connect

    Garcia, M

    1999-05-07

    An analytical model of plasma flow from a metal plate hit by an intense, pulsed, electron beam aims to bridge the gap between radiation-hydrodynamics simulations and experiments, and to quantify the self-effect of the electron beam penetrating the flow. Does the flow disrupt the tight focus of the initial electron bunch, or later pulses in a train? This work aims to model the spatial distribution of plasma speed, density, degree of ionization, and magnetization to inquire. The initial solid density, several eV plasma expands to 1 cm and 10{sup {minus}4} relative density by 2 {micro}s, beyond which numerical simulations are imprecise. Yet, a Faraday cup detector at the ETA-II facility is at 25 cm from the target and observes the flow after 50 {micro}s. The model helps bridge this gap. The expansion of the target plasma into vacuum is so rapid that the ionized portion of the flow departs from local thermodynamic equilibrium. When the temperature (in eV) in a parcel of fluid drops below V{sub i} x [(2{gamma} - 2)/(5{gamma} + 17)], where V{sub i} is the ionization potential of the target metal (7.8 eV for tantalum), and {gamma} is the ratio of specific heats (5/3 for atoms), then the fractional ionization and electron temperature in that parcel remain fixed during subsequent expansion. The freezing temperature as defined here is V{sub i}/19. The balance between the self-pinching force and the space charge repulsion of an electron beam changes on penetrating a flow: (i) the target plasma cancels the space-charge field, (ii) internal eddy currents arise to counter the magnetization of relativistic electrons, and (iii) electron beam heating alters the flow magnetization by changing the plasma density gradient and the magnitude of the conductivity.

  6. Electron beam-switched discharge for rapidly pulsed lasers

    DOEpatents

    Pleasance, L.D.; Murray, J.R.; Goldhar, J.; Bradley, L.P.

    1979-12-11

    A method and apparatus are designed for electrical excitation of a laser gas by application of a pulsed voltage across the gas, followed by passage of a pulsed, high energy electron beam through the gas to initiate a discharge suitable for laser excitation. This method improves upon current power conditioning techniques and is especially useful for driving rare gas halide lasers at high repetition rates.

  7. Transmission of High-Power Electron Beams Through Small Apertures

    SciTech Connect

    Tschalaer, Christoph; Alarcon, Ricardo O.; Balascuta, S.; Benson, Stephen V.; Bertozzi, William; Boyce, James R.; Cowan, Ray Franklin; Douglas, David R.; Evtushenko, Pavel; Fisher, Peter H.; Ihloff, Ernest E.; Kalantarians, Narbe; Kelleher, Aidan Michael; Legg, Robert A.; Milner, Richard; Neil, George R.; Ou, Longwu; Schmookler, Barak Abraham; Tennant, Christopher D.; Williams, Gwyn P.; Zhang, Shukui

    2013-11-01

    Tests were performed to pass a 100 MeV, 430 kWatt c.w. electron beam from the energy-recovery linac at the Jefferson Laboratory's FEL facility through a set of small apertures in a 127 mm long aluminum block. Beam transmission losses of 3 p.p.m. through a 2 mm diameter aperture were maintained during a 7 hour continuous run.

  8. Spectroscopy of Argon Excited in an Electron Beam Ion Trap

    SciTech Connect

    Trabert, E

    2005-04-18

    Argon is one of the gases best investigated and most widely used in plasma discharge devices for a multitude of applications that range from wavelength reference standards to controlled fusion experiments. Reviewing atomic physics and spectroscopic problems in various ionization stages of Ar, the past use and future options of employing an electron beam ion trap (EBIT) for better and more complete Ar data in the x-ray, EUV and visible spectral ranges are discussed.

  9. Radial electron-beam-breakup transit-time oscillator

    SciTech Connect

    Mostrom, M.A.; Kwan, T.J.T.

    1995-01-01

    A new radially-driven electron-beam-breakup transit-time oscillator has been investigated analytically and through computer simulation as a compact low-impedance high-power microwave generator. In a 1MV, 50kA device 35cm in radius and 15cm long, with no external magnetic field, 5GW of extracted power and a growth rate of 0.26/ns have been observed. Theoretical maximum efficiencies are several times higher.

  10. Electron Beam Diagnostics using Coherent Cherenkov Radiation in Aerogel

    SciTech Connect

    Tikhoplav, R.; Knyazik, A.; Rosenzweig, J. B.; Ruelas, M.

    2009-01-22

    The use of coherent Cherenkov radiation as a diagnostic tool for longitudinal distribution of an electron beam is studied in this paper. Coherent Cherenkov radiation is produced in an aerogel with an index of refraction close to unity. An aerogel spectral properties are experimentally studied and analyzed. This method will be employed for the helical IFEL bunching experiment at Neptune linear accelerator facility at UCLA.

  11. Characterization of electron beam melted uranium - 6% niobium ingots

    SciTech Connect

    McKoon, R.H.

    1997-10-31

    A study was undertaken at Lawrence Livermore National Laboratory to characterize uranium, 6{percent} niobium ingots produced via electron beam melting,hearth refining and continuous casting and to compare this material with conventional VIM/skull melt /VAR material. Samples of both the ingot and feed material were analyzed for niobium, trace metallic elements, carbon, oxygen and nitrogen. Ingot samples were also inspected metallographically and via microprobe analysis.

  12. Bulk Cutting of Carbon Nanotubes Using Electron Beam Irradiation

    NASA Technical Reports Server (NTRS)

    Ziegler, Kirk J. (Inventor); Rauwald, Urs (Inventor); Hauge, Robert H. (Inventor); Schmidt, Howard K. (Inventor); Smalley, Richard E. (Inventor); Kittrell, W. Carter (Inventor); Gu, Zhenning (Inventor)

    2013-01-01

    According to some embodiments, the present invention provides a method for attaining short carbon nanotubes utilizing electron beam irradiation, for example, of a carbon nanotube sample. The sample may be pretreated, for example by oxonation. The pretreatment may introduce defects to the sidewalls of the nanotubes. The method is shown to produces nanotubes with a distribution of lengths, with the majority of lengths shorter than 100 tun. Further, the median length of the nanotubes is between about 20 nm and about 100 nm.

  13. Ultrafast Time-Resolved Electron Diffraction with Megavolt Electron Beams

    SciTech Connect

    Hastings, J.B.; Rudakov, F.M.; Dowell, D.H.; Schmerge, J.F.; Cardoza, J.D.; Castro, J.M.; Gierman, S.M.; Loos, H.; Weber, P.M.; /Brown U.

    2006-10-24

    An rf photocathode electron gun is used as an electron source for ultrafast time-resolved pump-probe electron diffraction. We observed single-shot diffraction patterns from a 160 nm Al foil using the 5.4 MeV electron beam from the Gun Test Facility at the Stanford Linear Accelerator. Excellent agreement with simulations suggests that single-shot diffraction experiments with a time resolution approaching 100 fs are possible.

  14. The functionalization of graphene using electron-beam generated plasmas

    SciTech Connect

    Baraket, M.; Walton, S. G.; Lock, E. H.; Robinson, J. T.; Perkins, F. K.

    2010-06-07

    A plasmas-based, reversible functionalization of graphene is discussed. Using electron-beam produced plasmas, oxygen and fluorine functionalities have been added by changing the processing gas mixtures from Ar/O{sub 2} to Ar/SF{sub 6}, respectively. The reversibility of the functionalization was investigated by annealing the samples. The chemical composition and structural changes were studied by x-ray photoelectron spectroscopy and Raman spectroscopy.

  15. Rarefied flow diagnostics using pulsed high-current electron beams

    NASA Technical Reports Server (NTRS)

    Wojcik, Radoslaw M.; Schilling, John H.; Erwin, Daniel A.

    1990-01-01

    The use of high-current short-pulse electron beams in low-density gas flow diagnostics is introduced. Efficient beam propagation is demonstrated for pressure up to 300 microns. The beams, generated by low-pressure pseudospark discharges in helium, provide extremely high fluorescence levels, allowing time-resolved visualization in high-background environments. The fluorescence signal frequency is species-dependent, allowing instantaneous visualization of mixing flowfields.

  16. Return Current Electron Beams and Their Generation of "Raman" Scattering

    NASA Astrophysics Data System (ADS)

    Simon, A.

    1998-11-01

    For some years, we(A. Simon and R. W. Short, Phys. Rev. Lett. 53), 1912 (1984). have proposed that the only reasonable explanation for many of the observations of "Raman" scattering is the presence of an electron beam in the plasma. (The beam creates a bump-on-tail instability.) Two major objections to this picture have been observation of Raman when no n_c/4 surface was present, with no likely source for the electron beam, and the necessity for the initially outward directed beam to bounce once to create the proper waves. Now new observations on LLE's OMEGA(R. Petrasso et al), this conference. and at LULI(C. Labaune et al)., Phys. Plasma 5, 234 (1998). have suggested a new origin for the electron beam. This new scenario answers the previous objections, maintains electron beams as the explanation of the older experiments, and may clear up puzzling observations that have remained unexplained. The new scenario is based on two assumptions: (1) High positive potentials develop in target plasmas during their creation. (2) A high-intensity laser beam initiates spark discharges from nearby surfaces to the target plasma. The resulting return current of electrons should be much more delta-like, is initially inwardly directed, and no longer requires the continued presence of a n_c/4 surface. Scattering of the interaction beam from the BOT waves yields the observed Raman signal. Experimental observations that support this picture will be cited. ``Pulsation'' of the scattering and broadband ``flashes'' are a natural part of this scenario. This work was supported by the U.S. Department of Energy Office of Inertial Confinement Fusion under Cooperative Agreement No. DE-FC03-92SF19460.

  17. Electron-beam studies of Schottky-barrier detector surfaces

    NASA Technical Reports Server (NTRS)

    Peckerar, M. C.

    1973-01-01

    Review of the surface anomalies occurring in Schottky-barrier particle detectors identifiable by means of an electron beam technique employed by Czaja (1965) for analyzing defects in diode structures. The technique is shown to make possible the detection and identification of the following anomalies: (1) chemical contamination of the detector surface; (2) mechanical damage of the wafer substrates; (3) damage introduced in semiconductor surface preparation; (4) radiation damage; and (5) defective surface metallization.

  18. Electron Beam Welding to Join Gamma Titanium Aluminide Articles

    NASA Technical Reports Server (NTRS)

    Kelly, Thomas Joseph (Inventor)

    2008-01-01

    A method is provided for welding two gamma titanium aluminide articles together. The method includes preheating the two articles to a welding temperature of from about 1700 F to about 2100 F, thereafter electron beam welding the two articles together at the welding temperature and in a welding vacuum to form a welded structure, and thereafter annealing the welded structure at an annealing temperature of from about 1800 F to about 2200 F, to form a joined structure.

  19. Electron beam, laser beam and plasma arc welding studies

    NASA Technical Reports Server (NTRS)

    Banas, C. M.

    1974-01-01

    This program was undertaken as an initial step in establishing an evaluation framework which would permit a priori selection of advanced welding processes for specific applications. To this end, a direct comparison of laser beam, electron beam and arc welding of Ti-6Al-4V alloy was undertaken. Ti-6Al-4V was selected for use in view of its established welding characteristics and its importance in aerospace applications.

  20. Electron beam spot size stabilization for radiographic application

    SciTech Connect

    Kwan, T.J.T.; Snell, C.M.

    1998-12-31

    The authors have demonstrated through computer simulations that self-biasing the target can effectively control the ion column which causes radial pinching of the electron beam, resulting in the growth of spot size on target. This method has the unique features in simplicity and non-intrusiveness in its implementation into radiographic systems. The concept is being actively explored experimentally at the Integrated Test Stand (ITS).

  1. Electron Beam Diagnostics using Coherent Cherenkov Radiation in Aerogel

    NASA Astrophysics Data System (ADS)

    Tikhoplav, R.; Knyazik, A.; Rosenzweig, J. B.; Ruelas, M.

    2009-01-01

    The use of coherent Cherenkov radiation as a diagnostic tool for longitudinal distribution of an electron beam is studied in this paper. Coherent Cherenkov radiation is produced in an aerogel with an index of refraction close to unity. An aerogel spectral properties are experimentally studied and analyzed. This method will be employed for the helical IFEL bunching experiment at Neptune linear accelerator facility at UCLA.

  2. Electron-beam modification of coating - aluminum substrate systems

    NASA Astrophysics Data System (ADS)

    Ivanov, Yu F.; Krysina, O. V.; Teresov, A. D.; Gracheva, M. E.

    2015-01-01

    Multiphase surface alloys with improved strength and tribological characteristics have been synthesized by exposing coating/A7 substrate systems to a pulsed electron beam. Optimum modes of electron-ion-plasma treatment of commercially pure aluminum have been found at which the wear resistance and hardness of the surface layer were observed to increase by a factor of about 7.5 and up to 18, respectively.

  3. Process development for electron beam joining of ceramic and glass components

    SciTech Connect

    Turman, B.N.; Glass, S.J.; Yang, P.; Gerstle, F.P.; Halbleib, J.A.; Voth, T.E.; McKenzie, B.; Clifford, J.R.; Habiger, K.

    1997-11-01

    The purpose of this project is to develop and extend the electron beam joining process to applications related to Mo/Al{sub 2}O{sub 3} cermets for neutron tube fabrication, glass seals for flat panel displays, and ceramics for structural applications. The key issue is the identification of the allowable operating ranges that produce thermal conditions favorable to robust joining and sealing. High strength, hermetic braze joints between ceramic components have been produced using high energy electron beams. With a penetration depth into a typical ceramic of {approximately} 1 cm for a 10 MeV electron beam, this method provides the capability for rapid, transient brazing operations where temperature control of heat sensitive components is essential. The method deposits energy directly into a buried joint, allowing otherwise inaccessible interfaces to be brazed. The combination of transient heating, with higher thermal conductivity, lower heat capacity, and lower melting temperature of braze metals relative to the ceramic materials, enables a pulsed high power beam to melt a braze metal without producing excessive ceramic temperatures. The authors have demonstrated the feasibility of this process related to ceramic coupons a well as ceramic and glass tubes and cylindrical shapes. The transient thermal response was predicted, using as input the energy absorption predicted from the coupled electron-photon and thermal transport analysis. The joining experiments were conducted with an RF linear accelerator at 10--13 MV. Joining experiments have provided high strength joints between alumina and alumina and between alumina and cermet joints in cylindrical geometry. These joints provided good hermetic seals.

  4. Conceptual design for an electron-beam heated hypersonic wind tunnel

    SciTech Connect

    Lipinski, R.J.; Kensek, R.P.

    1997-07-01

    There is a need for hypersonic wind-tunnel testing at about mach 10 and above using natural air and simulating temperatures and pressures which are prototypic of flight at 50 km altitude or below. With traditional wind-tunnel techniques, gas cooling during expansion results in exit temperatures which are too low. Miles, et al., have proposed overcoming this difficulty by heating the air with a laser beam as it expands in the wind-tunnel nozzle. This report discusses an alternative option of using a high-power electron beam to heat the air as it expands. In the e-beam heating concept, the electron beam is injected into the wind-tunnel nozzle near the exit and then is guided upstream toward the nozzle throat by a strong axial magnetic field. The beam deposits most of its power in the dense air near the throat where the expansion rate is greatest. A conceptual design is presented for a large-scale system which achieves Mach 14 for 0.1 seconds with an exit diameter of 2.8 meters. It requires 450 MW of electron beam power (5 MeV at 90 A). The guiding field is 500 G for most of the transport length and increases to 100 kG near the throat to converge the beam to a 1.0-cm diameter. The beam generator is a DC accelerator using a Marx bank (of capacitors) and a diode stack with a hot cathode. 14 refs. 38 figs., 9 tabs.

  5. The electron beam cure of epoxy paste adhesives

    SciTech Connect

    Farmer, J.D.; Janke, C.J.; Lopata, V.J.

    1998-07-01

    Recently developed epoxy paste adhesives were electron beam cured and experimentally explored to determine their suitability for use in an aerospace-quality aircraft component. There were two major goals for this program. The first was to determine whether the electron beam-curable past adhesives were capable of meeting the requirements of the US Air Force T-38 supersonic jet trainer composite windshield frame. The T-38 windshield frame`s arch is currently manufactured by bonding thin stainless steel plies using an aerospace-grade thermally-cured epoxy film adhesive. The second goal was to develop the lowest cost hand layup and debulk process that could be used to produce laminated steel plies with acceptable properties. The laminate properties examined to determine adhesive suitability include laminate mechanical and physical properties at room, adhesive tack, out-time capability, and the debulk requirements needed to achieve these properties. Eighteen past adhesives and four scrim cloths were experimentally examined using this criteria. One paste adhesive was found to have suitable characteristics in each of these categories and was later chosen for the manufacture of the T-38 windshield frame. This experimental study shows that by using low-cost debulk and layup processes, the electron beam-cured past adhesive mechanical and physical properties meet the specifications of the T-38 composite windshield frame.

  6. Electron Beam Alignment Strategy in the LCLS Undulators

    SciTech Connect

    Nuhn, H.-D.; Emma, P.J.; Gassner, G.L.; LeCocq, C.M.; Peters, E.; Ruland, R.E.; /SLAC

    2007-01-03

    The x-ray FEL process puts very tight tolerances on the straightness of the electron beam trajectory (2 {micro}m rms) through the LCLS undulator system. Tight but less stringent tolerances of 80 {micro}m rms vertical and 140 {micro}m rms horizontally are to be met for the placement of the individual undulator segments with respect to the beam axis. The tolerances for electron beam straightness can only be met through beam-based alignment (BBA) based on electron energy variations. Conventional alignment will set the start conditions for BBA. Precision-fiducialization of components mounted on remotely adjustable girders and the use of beam-finder wires (BFW) will satisfy placement tolerances. Girder movement due to ground motion and temperature changes will be monitored continuously by an alignment monitoring system (ADS) and remotely corrected. This stabilization of components as well as the monitoring and correction of the electron beam trajectory based on BPMs and correctors will increase the time between BBA applications. Undulator segments will be periodically removed from the undulator Hall and measured to monitor radiation damage and other effects that might degrade undulator tuning.

  7. Conceptual Design of Electron-Beam Generated Plasma Tools

    NASA Astrophysics Data System (ADS)

    Agarwal, Ankur; Rauf, Shahid; Dorf, Leonid; Collins, Ken; Boris, David; Walton, Scott

    2015-09-01

    Realization of the next generation of high-density nanostructured devices is predicated on etching features with atomic layer resolution, no damage and high selectivity. High energy electron beams generate plasmas with unique features that make them attractive for applications requiring monolayer precision. In these plasmas, high energy beam electrons ionize the background gas and the resultant daughter electrons cool to low temperatures via collisions with gas molecules and lack of any accelerating fields. For example, an electron temperature of <0.6 eV with densities comparable to conventional plasma sources can be obtained in molecular gases. The chemistry in such plasmas can significantly differ from RF plasmas as the ions/radicals are produced primarily by beam electrons rather than those in the tail of a low energy distribution. In this work, we will discuss the conceptual design of an electron beam based plasma processing system. Plasma properties will be discussed for Ar, Ar/N2, and O2 plasmas using a computational plasma model, and comparisons made to experiments. The fluid plasma model is coupled to a Monte Carlo kinetic model for beam electrons which considers gas phase collisions and the effect of electric and magnetic fields on electron motion. The impact of critical operating parameters such as magnetic field, beam energy, and gas pressure on plasma characteristics in electron-beam plasma processing systems will be discussed. Partially supported by the NRL base program.

  8. Electron Beam Welder Used to Braze Sapphire to Platinum

    NASA Technical Reports Server (NTRS)

    Forsgren, Roger C.; Vannuyen, Thomas

    1998-01-01

    A new use for electron beam brazing was recently developed by NASA Lewis Research Center's Manufacturing Engineering Division. This work was done to fabricate a fiberoptic probe (developed by Sentec Corporation) that could measure high temperatures less than 600 deg C of vibrating machinery, such as in jet engine combustion research. Under normal circumstances, a sapphire fiber would be attached to platinum by a ceramic epoxy. However, no epoxies can adhere ceramic fibers to platinum under such high temperatures and vibration. Also, since sapphire and platinum have different thermal properties, the epoxy bond is subjected to creep over time. Therefore, a new method had to be developed that would permanently and reliably attach a sapphire fiber to platinum. Brazing a sapphire fiber to a platinum shell. The fiber-optic probe assembly consists of a 0.015-in.-diameter sapphire fiber attached to a 0.25-in.-long, 0.059-in.-diameter platinum shell. Because of the small size of this assembly, electron beam brazing was chosen instead of conventional vacuum brazing. The advantage of the electron beam is that it can generate a localized heat source in a vacuum. Gold reactive braze was used to join the sapphire fiber and the platinum. Consequently, the sapphire fiber was not affected by the total heat needed to braze the components together.

  9. Electron beam induced current in the high injection regime

    NASA Astrophysics Data System (ADS)

    Haney, Paul M.; Yoon, Heayoung P.; Koirala, Prakash; Collins, Robert W.; Zhitenev, Nikolai B.

    2015-07-01

    Electron beam induced current (EBIC) is a powerful technique which measures the charge collection efficiency of photovoltaics with sub-micron spatial resolution. The exciting electron beam results in a high generation rate density of electron-hole pairs, which may drive the system into nonlinear regimes. An analytic model is presented which describes the EBIC response when the total electron-hole pair generation rate exceeds the rate at which carriers are extracted by the photovoltaic cell, and charge accumulation and screening occur. The model provides a simple estimate of the onset of the high injection regime in terms of the material resistivity and thickness, and provides a straightforward way to predict the EBIC lineshape in the high injection regime. The model is verified by comparing its predictions to numerical simulations in one- and two-dimensions. Features of the experimental data, such as the magnitude and position of maximum collection efficiency versus electron beam current, are consistent with the three-dimensional model.

  10. Electron beam induced current in the high injection regime.

    PubMed

    Haney, Paul M; Yoon, Heayoung P; Koirala, Prakash; Collins, Robert W; Zhitenev, Nikolai B

    2015-07-24

    Electron beam induced current (EBIC) is a powerful technique which measures the charge collection efficiency of photovoltaics with sub-micron spatial resolution. The exciting electron beam results in a high generation rate density of electron-hole pairs, which may drive the system into nonlinear regimes. An analytic model is presented which describes the EBIC response when the total electron-hole pair generation rate exceeds the rate at which carriers are extracted by the photovoltaic cell, and charge accumulation and screening occur. The model provides a simple estimate of the onset of the high injection regime in terms of the material resistivity and thickness, and provides a straightforward way to predict the EBIC lineshape in the high injection regime. The model is verified by comparing its predictions to numerical simulations in one- and two-dimensions. Features of the experimental data, such as the magnitude and position of maximum collection efficiency versus electron beam current, are consistent with the three-dimensional model.

  11. Upgrade of the electron beam ion trap in Shanghai

    SciTech Connect

    Lu, D.; Yang, Y.; Xiao, J.; Shen, Y.; Fu, Y.; Wei, B.; Yao, K.; Hutton, R.; Zou, Y.

    2014-09-15

    Over the last few years the Shanghai electron beam ion trap (EBIT) has been successfully redesigned and rebuilt. The original machine, developed under collaboration with the Shanghai Institute of Applied Physics, first produced an electron beam in 2005. It could be tuned with electron energies between 1 and 130 keV and beam current up to 160 mA. After several years of operation, it was found that several modifications for improvements were necessary to reach the goals of better electron optics, higher photon detection, and ion injection efficiencies, and more economical running costs. The upgraded Shanghai-EBIT is made almost entirely from Ti instead of stainless steel and achieves a vacuum of less than 10{sup −10} Torr, which helps to minimize the loss of highly changed ions through charge exchange. Meanwhile, a more compact structure and efficient cryogenic system, and excellent optical alignment have been of satisfactory. The magnetic field in the central trap region can reach up till 4.8 T with a uniformity of 2.77 × 10{sup −4}. So far the upgraded Shanghai-EBIT has been operated up to an electron energy of 151 keV and a beam current of up to 218 mA, although promotion to even higher energy is still in progress. Radiation from ions as highly charged as Xe{sup 53+,} {sup 54+} has been produced and the characterization of current density is estimated from the measured electron beam width.

  12. A Survey of Electron Beams Associated With Saturnian Auroral Hiss

    NASA Astrophysics Data System (ADS)

    Kopf, A.; Gurnett, D. A.; Hospodarsky, G. B.; Kurth, W. S.; Menietti, J. D.; Dougherty, M.; Mitchell, D. G.; Leisner, J. S.; Khurana, K. K.; Grimald, S.; Arridge, C. S.; Schippers, P.; Andre, N.; Coates, A. J.; Santolik, O.

    2009-12-01

    Over the last three years, the Cassini spacecraft underwent a series of high inclination orbits, allowing investigation and measurements of the Saturnian auroral zone. The Radio and Plasma Wave Science (RPWS) Investigation has detected low frequency funnel-shaped whistler mode emissions along the auroral field lines, much like the auroral hiss observed at Earth. The poleward and equatorward flaring of the auroral hiss funnel on the frequency-time spectrogram is the result of whistler mode waves propagating upward into a region of diminishing plasma density. These detections are important in understanding the auroral processes occurring at Saturn. Recent efforts have focused on integrating RPWS data with that from other instruments, particularly from the CAPS-ELS investigation. Electron beams are known to be the source of auroral hiss emission at Earth, and it is generally believed the same is true at Saturn. Current work has focused on correlating these beams with the observed radio emission, along with modeling the beams to calculate their growth rates. One electron beam has already been analyzed from the high-latitude pass on October 17, 2008. This beam was determined to be propagating upward from Saturn, and has been found to produce a large whistler-mode growth rate, which fits with the auroral hiss model. More electron beams will be analyzed in this fashion over the coming months. These results will be the focus of this presentation.

  13. Investigation of electron beam transport in a helical undulator

    SciTech Connect

    Jeong, Y.U.; Lee, B.C.; Kim, S.K.

    1995-12-31

    Lossless transport of electrons through the undulator is essential for CW operation of the FELs driven by recirculating electrostatic accelerators. We calculate the transport ratio of an electron beam in a helical undulator by using a 3-D simulation code and compare the results with the experimental results. The energy and the current of the electron beam are 400 keV and 2 A, respectively. The 3-D distribution of the magnetic field of a practical permanent-magnet helical undulator is measured and is used in the calculations. The major parameters of the undutlator are : period = 32 mm, number of periods = 20, number of periods in adiabatic region = 3.5, magnetic field strength = 1.3 kG. The transport ratio is very sensitive to the injection condition of the electron beam such as the emittance, the diameter, the divergence, etc.. The injection motion is varied in the experiments by changing the e-gun voltage or the field strength of the focusing magnet located at the entrance of the undulator. It is confirmed experimentally and with simulations that most of the beam loss occurs at the adiabatic region of the undulator regardless of the length of the adiabatic region The effect of axial guiding magnetic field on the beam finish is investigated. According to the simulations, the increase of the strength of axial magnetic field from 0 to 1 kG results in the increase of the transport ratio from 15 % to 95%.

  14. Electron Beam Quality Determination Through Fricke Xylenol Gel Dosimeter

    SciTech Connect

    Petchevist, P. C. D.; Moreira, M. V.; Almeida, A. de

    2009-03-10

    According to the IAEA TRS-398 protocol, a parallel plate ionization chamber is recommended to be used in electron dosimetry. The important dosimetric parameters such as R{sub 100} and R{sub 50}, inferred from the percentage depth dose (PDD) curve, allow to obtain the electron beam average energy at the water phantom surface (material equivalent to the soft tissue). In this work, a chemical dosimeter based on the Fe(II) to Fe(III) oxidation was used to obtain the average energies from electrons beams (from nominal energies of 5, 8 and 10 MeV) and related parameters of R{sub 100}, R{sub 50} and z{sub ref}. These energies obtained through the Fricke Xylenol Gel (FXG) were compared to those with a parallel plate ionization chamber, following the cited protocol, which showed no significant differences. From these measurements one can conclude the FXG applicability for R{sub 100}, R{sub 50} and electron beam average energy determination.

  15. Electron Beam Charge Diagnostics for Laser Plasma Accelerators

    SciTech Connect

    Nakamura, Kei; Gonsalves, Anthony; Lin, Chen; Smith, Alan; Rodgers, David; Donahue, Rich; Byrne, Warren; Leemans, Wim

    2011-06-27

    A comprehensive study of charge diagnostics is conducted to verify their validity for measuring electron beams produced by laser plasma accelerators (LPAs). First, a scintillating screen (Lanex) was extensively studied using subnanosecond electron beams from the Advanced Light Source booster synchrotron, at the Lawrence Berkeley National Laboratory. The Lanex was cross calibrated with an integrating current transformer (ICT) for up to the electron energy of 1.5 GeV, and the linear response of the screen was confirmed for charge density and intensity up to 160 pC/mm{sup 2} and 0.4 pC/(ps mm{sup 2}), respectively. After the radio-frequency accelerator based cross calibration, a series of measurements was conducted using electron beams from an LPA. Cross calibrations were carried out using an activation-based measurement that is immune to electromagnetic pulse noise, ICT, and Lanex. The diagnostics agreed within {+-}8%, showing that they all can provide accurate charge measurements for LPAs.

  16. Stimulated emission of electron beam in nanotube bundles

    NASA Astrophysics Data System (ADS)

    Batrakov, K. G.; Kuzhir, P. P.; Maksimenko, S. A.

    2008-05-01

    Recently, a hypothetical nanoscale lasing device exploiting the emission of electromagnetic waves by electron beam in an isolated carbon nanotube (CNT) has been proposed [K.G. Batrakov, P.P. Kuzhir, S.A. Maksimenko, in: A. Lakhtakia, S.A. Maksimenko (Eds.), Proceedings of the SPIE, vol. 6328, 2006, p. 63280Z]. The present work considers the stimulated emission of an electron beam in CNT bundles. It is shown that the modification of electron wavefunction in CNT bundle as compared with isolated CNT can result in a significant change of the electron beam propagation in nanotubes. Two cases of the CNT collection arrangement-a “square” lattice and a densely packed bundle of CNTs-are discussed. The distribution of the electron density corresponding to four- and six-wave diffraction in the CNT collection is presented. The ranges where the electron scattering is suppressed are found to be preferable for lasing. The proposed way to increase the generation length extends substantially the potentiality of CNT bundle as a basic element of the nanoscale analog of the traveling wave tube (TWT), backward oscillator (BWO) and free-electron laser (FEL).

  17. The use of electron beams for pasteurization of meats

    SciTech Connect

    Prestwich, K.R.; Kaye, R.J.; Turman, B.N.; Neau, E.L.

    1994-12-01

    Electron beam accelerators can be used for electronic pasteurization of meat products by: (1) using the electrons directly impacting the products, or (2) optimizing the conversion of electron energy to x-rays and treating the product with these x-rays. The choice of process depends on the configuration of the product when it is treated. For electron treatment, ten million electron volt (MeV) kinetic energy is the maximum allowed by international agreement. The depth of penetration of electrons with that energy into a product with density of meat is about five centimeters (cm). Two-sided treatment can be done on products up to 10 cm thick with a two-to-one ratio between minimum and maximum dose. Ground beef patties are about 1.25 cm (0.5 inch thick). Beams with 2.5 MeV electron energy could be used to treat these products. Our calculations show that maximum to minimum dose ratios less than 1.2 can be achieved with this energy if the transverse beam energy is small. If the product thickness is greater than 10 cm, x-rays can provide the needed dose uniformity. Uniform doses can be supplied for pallets with dimensions greater than 1.2 m on each side using x-rays from a 5 MeV electron beam. The efficiency of converting the electron beam to x-rays and configurations to achieve dose uniformity are discussed.

  18. Suppression of shot noise and spontaneous radiation in electron beams

    SciTech Connect

    Litvinenko,V.

    2009-08-23

    Shot noise in the electron beam distribution is the main source of noise in high-gain FEL amplifiers, which may affect applications ranging from single- and multi-stage HGHG FELs to an FEL amplifier for coherent electron cooling. This noise also imposes a fundamental limit of about 10{sup 6} on FEL gain, after which SASE FELs saturate. There are several advantages in strongly suppressing this shot noise in the electron beam, and the corresponding spontaneous radiation. For more than a half-century, a traditional passive method has been used successfully in practical low-energy microwave electronic devices to suppress shot noise. Recently, it was proposed for this purpose in FELs. However, being passive, the method has some significant limitations and is hardly suitable for the highly inhomogeneous beams of modern high-gain FELs. I present a novel active method of suppressing, by many orders-of-magnitude, the shot noise in relativistic electron beams. I give a theoretical description of the process, and detail its fundamental limitation.

  19. Electron beam current in high power cylindrical diode

    SciTech Connect

    Roy, Amitava; Menon, R.; Mitra, S.; Sharma, Vishnu; Singh, S. K.; Nagesh, K. V.; Chakravarthy, D. P.

    2010-01-15

    Intense electron beam generation studies were carried out in high power cylindrical diode to investigate the effect of the accelerating gap and diode voltage on the electron beam current. The diode voltage has been varied from 130 to 356 kV, whereas the current density has been varied from 87 to 391 A/cm{sup 2} with 100 ns pulse duration. The experimentally obtained electron beam current in the cylindrical diode has been compared with the Langmuir-Blodgett law. It was found that the diode current can be explained by a model of anode and cathode plasma expanding toward each other. However, the diode voltage and current do not follow the bipolar space-charge limited flow model. It was also found that initially only a part of the cathode take part in the emission process. The plasma expands at 4.2 cm/mus for 1.7 cm anode-cathode gap and the plasma velocity decreases for smaller gaps. The electrode plasma expansion velocity of the cylindrical diode is much smaller as compared with the planar diode for the same accelerating gap and diode voltage. Therefore, much higher voltage can be obtained for the cylindrical diodes as compared with the planar diodes for the same accelerating gap.

  20. Excitation of Plasma Waves in Aurora by Electron Beams

    NASA Technical Reports Server (NTRS)

    daSilva, C. E.; Vinas, A. F.; deAssis, A. S.; deAzevedo, C. A.

    1996-01-01

    In this paper, we study numerically the excitation of plasma waves by electron beams, in the auroral region above 2000 km of altitude. We have solved the fully kinetic dispersion relation, using numerical method and found the real frequency and the growth rate of the plasma wave modes. We have examined the instability properties of low-frequency waves such as the Electromagnetic Ion Cyclotron (EMIC) wave as well as Lower-Hybrid (LH) wave in the range of high-frequency. In all cases, the source of free energy are electron beams propagating parallel to the geomagnetic field. We present some features of the growth rate modes, when the cold plasma parameters are changed, such as background electrons and ions species (H(+) and O(+)) temperature, density or the electron beam density and/or drift velocity. These results can be used in a test-particle simulation code, to investigate the ion acceleration and their implication in the auroral acceleration processes, by wave-particle interaction.

  1. Validity of closed periodic magnetic focusing for sheet electron beams

    SciTech Connect

    Zhao Ding

    2009-11-15

    Theoretical analyses and numerical calculations have demonstrated that a closed periodic cusped magnetic (PCM) field can effectively confine a sheet electron beam in two transverse directions (i.e., in the wide and narrow dimensions, simultaneously) for stable long distance transport in which the sizes of the beam cross section are set by referring to the present state of the art. Moreover, the method for matching the transverse magnetic focusing force and the inner space charge force in the wide dimension of the sheet electron beam is given, and the longitudinal periodic length and the cross sectional shape of the closed PCM focusing structure can be determined. Calculations also demonstrate that the optimum focusing state can be attained by adjusting the wide dimension on the transverse section of the closed PCM structure independently. The work presented in this paper indicates that the closed PCM structure is very promising for the confinement of the sheet electron beam, and it can be helpful for guiding practical engineering design.

  2. Electron beam energy QA - a note on measurement tolerances.

    PubMed

    Meyer, Juergen; Nyflot, Matthew J; Smith, Wade P; Wottoon, Landon S; Young, Lori; Yang, Fei; Kim, Minsun; Hendrickson, Kristi R G; Ford, Eric; Kalet, Alan M; Cao, Ning; Dempsey, Claire; Sandison, George A

    2016-01-01

    Monthly QA is recommended to verify the constancy of high-energy electron beams generated for clinical use by linear accelerators. The tolerances are defined as 2%/2 mm in beam penetration according to AAPM task group report 142. The practical implementation is typically achieved by measuring the ratio of readings at two different depths, preferably near the depth of maximum dose and at the depth corresponding to half the dose maximum. Based on beam commissioning data, we show that the relationship between the ranges of energy ratios for different electron energies is highly nonlinear. We provide a formalism that translates measurement deviations in the reference ratios into change in beam penetration for electron energies for six Elekta (6-18 MeV) and eight Varian (6-22 MeV) electron beams. Experimental checks were conducted for each Elekta energy to compare calculated values with measurements, and it was shown that they are in agreement. For example, for a 6 MeV beam a deviation in the measured ionization ratio of ± 15% might still be acceptable (i.e., be within ± 2 mm), whereas for an 18 MeV beam the corresponding tolerance might be ± 6%. These values strongly depend on the initial ratio chosen. In summary, the relationship between differences of the ionization ratio and the corresponding beam energy are derived. The findings can be translated into acceptable tolerance values for monthly QA of electron beam energies. PMID:27074488

  3. Electron Beam Transport in Advanced Plasma Wave Accelerators

    SciTech Connect

    Williams, Ronald L

    2013-01-31

    The primary goal of this grant was to develop a diagnostic for relativistic plasma wave accelerators based on injecting a low energy electron beam (5-50keV) perpendicular to the plasma wave and observing the distortion of the electron beam's cross section due to the plasma wave's electrostatic fields. The amount of distortion would be proportional to the plasma wave amplitude, and is the basis for the diagnostic. The beat-wave scheme for producing plasma waves, using two CO2 laser beam, was modeled using a leap-frog integration scheme to solve the equations of motion. Single electron trajectories and corresponding phase space diagrams were generated in order to study and understand the details of the interaction dynamics. The electron beam was simulated by combining thousands of single electrons, whose initial positions and momenta were selected by random number generators. The model was extended by including the interactions of the electrons with the CO2 laser fields of the beat wave, superimposed with the plasma wave fields. The results of the model were used to guide the design and construction of a small laboratory experiment that may be used to test the diagnostic idea.

  4. A high-performance electron beam ion source

    SciTech Connect

    Alessi,J.; Beebe, E.; Bellavia, S.; Gould, O.; Kponou, A.; Lambiase, R.; Lockey, R.; McCafferty, D.; Okamura, M.; Pikin, A. I.; Raparia, D.; Ritter, J.; Syndstrup, L.

    2009-06-08

    At Brookhaven National Laboratory, a high current Electron Beam Ion Source (EBIS) has been developed as part of a new preinjector that is under construction to replace the Tandem Van de Graaffs as the heavy ion preinjector for the RHIC and NASA experimental programs. This preinjector will produce milliampere-level currents of essentially any ion species, with q/A {ge} 1/6, in short pulses, for injection into the Booster synchrotron. In order to produce the required intensities, this EBIS uses a 10A electron gun, and an electron collector designed to handle 300 kW of pulsed electron beam power. The EBIS trap region is 1.5 m long, inside a 5T, 2m long, 8-inch bore superconducting solenoid. The source is designed to switch ion species on a pulse-to-pulse basis, at a 5 Hz repetition rate. Singly-charged ions of the appropriate species, produced external to the EBIS, are injected into the trap and confined until the desired charge state is reached via stepwise ionization by the electron beam. Ions are then extracted and matched into an RFQ, followed by a short IH Linac, for acceleration to 2 MeV/A, prior to injection into the Booster synchrotron. An overview of the preinjector is presented, along with experimental results from the prototype EBIS, where all essential requirements have already been demonstrated. Design features and status of construction of the final high intensity EBIS is also be presented.

  5. The influence of magnetic field on electron beam generated plasmas

    NASA Astrophysics Data System (ADS)

    Petrov, G. M.; Boris, D. R.; Lock, E. H.; Petrova, Tz B.; Fernsler, R. F.; Walton, S. G.

    2015-06-01

    Magnetically confined argon plasma in a long cylindrical tube driven by an electron beam is studied experimentally and theoretically. Langmuir probes are used to measure the electron energy distribution function, electron density and temperature in plasmas generated by 2 keV, 10 mA electron beams in a 25 mTorr argon background for magnetic field strengths of up to 200 Gauss. The experimental results agree with simulations done using a spatially averaged Boltzmann model adapted to treat an electron beam generated plasma immersed in a constant magnetic field. The confining effect of the magnetic field is studied theoretically using fluid and kinetic approaches. The fluid approach leads to two regimes of operation: weakly and strongly magnetized. The former is similar to the magnetic field-free case, while in the latter the ambipolar diffusion coefficient and electron density depend quadratically on the magnetic field strength. Finally, a more rigorous kinetic treatment, which accounts for the impact of the magnetic field over the whole distribution of electrons, is used for accurate description of the plasma.

  6. Upgrade of the electron beam ion trap in Shanghai.

    PubMed

    Lu, D; Yang, Y; Xiao, J; Shen, Y; Fu, Y; Wei, B; Yao, K; Hutton, R; Zou, Y

    2014-09-01

    Over the last few years the Shanghai electron beam ion trap (EBIT) has been successfully redesigned and rebuilt. The original machine, developed under collaboration with the Shanghai Institute of Applied Physics, first produced an electron beam in 2005. It could be tuned with electron energies between 1 and 130 keV and beam current up to 160 mA. After several years of operation, it was found that several modifications for improvements were necessary to reach the goals of better electron optics, higher photon detection, and ion injection efficiencies, and more economical running costs. The upgraded Shanghai-EBIT is made almost entirely from Ti instead of stainless steel and achieves a vacuum of less than 10(-10) Torr, which helps to minimize the loss of highly changed ions through charge exchange. Meanwhile, a more compact structure and efficient cryogenic system, and excellent optical alignment have been of satisfactory. The magnetic field in the central trap region can reach up till 4.8 T with a uniformity of 2.77 × 10(-4). So far the upgraded Shanghai-EBIT has been operated up to an electron energy of 151 keV and a beam current of up to 218 mA, although promotion to even higher energy is still in progress. Radiation from ions as highly charged as Xe(53+, 54+) has been produced and the characterization of current density is estimated from the measured electron beam width.

  7. Novel in situ method for locating virtual source in high-rate electron-beam evaporation

    NASA Astrophysics Data System (ADS)

    Bhatia, M. S.

    1994-07-01

    The concept of virtual source simplifies calculation of thickness distribution on extended substrates in high rate vacuum coating employing electron-beam heating. The height of the point (virtual source), from which vapor can be assumed to emanate in accordance with Knudsen's cosine law, to yield the experimentally obtained thickness distribution, is calculated and this establishes the position of virtual source. Such as post facto determination is cumbersome as it is valid for the prescribed material evaporating at a certain rate in a specified geometry. A change in any of these entails a fresh measurement. Experimenters who use a large number of materials and deposit at different rates therefore have to carry out a number of trials before they can locate the virtual source at the desired deposition parameters. An in situ method for obtaining virtual source position can go a long way in reducing the labor of these experiments. A novel in situ method is described to locate the virtual source.

  8. Frequency multiplying oscillator with an electron beam accelerated in a drift space

    SciTech Connect

    Jang, Kyu-Ha; Lee, Kitae; Hee Park, Seong; Uk Jeong, Young; Miginsky, S.

    2012-07-02

    In a uniform acceleration region, the behavior of a velocity-modulated electron beam has been analyzed using a particle-in-cell code. By making use of one of the accelerated harmonic components of the velocity-modulated electron beam, we demonstrate a frequency multiplying oscillator for a compact THz emitter, which employs multiple electron beams and a higher order mode resonator to modulate the electron beam without an additional driving source.

  9. Simulation study of interactions of Space Shuttle-generated electron beams with ambient plasmas

    NASA Technical Reports Server (NTRS)

    Lin, Chin S.

    1992-01-01

    This report summarizes results obtained through the support of NASA Grant NAGW-1936. The objective of this report is to conduct large scale simulations of electron beams injected into space. The topics covered include the following: (1) simulation of radial expansion of an injected electron beam; (2) simulations of the active injections of electron beams; (3) parameter study of electron beam injection into an ionospheric plasma; and (4) magnetosheath-ionospheric plasma interactions in the cusp.

  10. Relativistic electron beam acceleration by Compton scattering of extraordinary waves

    SciTech Connect

    Sugaya, R.

    2006-05-15

    Relativistic transport equations, which demonstrate that relativistic and nonrelativistic particle acceleration along and across a magnetic field and the generation of an electric field transverse to the magnetic field, are induced by nonlinear wave-particle scattering (nonlinear Landau and cyclotron damping) of almost perpendicularly propagating electromagnetic waves in a relativistic magnetized plasma were derived from the relativistic Vlasov-Maxwell equations. The relativistic transport equations show that electromagnetic waves can accelerate particles in the k{sup ''} direction (k{sup ''}=k-k{sup '}). Simultaneously, an intense cross-field electric field, E{sub 0}=B{sub 0}xv{sub d}/c, is generated via the dynamo effect owing to perpendicular particle drift to satisfy the generalized Ohm's law, which means that this cross-field particle drift is identical to the ExB drift. On the basis of these equations, acceleration and heating of a relativistic electron beam due to nonlinear wave-particle scattering of electromagnetic waves in a magnetized plasma were investigated theoretically and numerically. Two electromagnetic waves interact nonlinearly with the relativistic electron beam, satisfying the resonance condition of {omega}{sub k}-{omega}{sub k{sup '}}-(k{sub perpendicular}-k{sub perpendicula=} r{sup '})v{sub d}-(k{sub parallel}-k{sub parallel}{sup '})v{sub b}{approx_equal}m{omega}{sub ce}, where v{sub b} and v{sub d} are the parallel and perpendicular velocities of the relativistic electron beam, respectively, and {omega}{sub ce} is the relativistic electron cyclotron frequency. The relativistic transport equations using the relativistic drifted Maxwellian momentum distribution function of the relativistic electron beam were derived and analyzed. It was verified numerically that extraordinary waves can accelerate the highly relativistic electron beam efficiently with {beta}m{sub e}c{sup 2} < or approx. 1 GeV, where {beta}=(1-v{sub b}{sup 2}/c{sup 2}){sup -1/2}.

  11. Electron Beam Freeform Fabrication (EBF3) for Cost Effective Near-Net Shape Manufacturing

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M.; Hafley, Robert A.

    2006-01-01

    Manufacturing of structural metal parts directly from computer aided design (CAD) data has been investigated by numerous researchers over the past decade. Researchers at NASA Langley Research Center are developing a new solid freeform fabrication process, electron beam freeform fabrication (EBF3), as a rapid metal deposition process that works efficiently with a variety of weldable alloys. EBF3 deposits of 2219 aluminium and Ti-6Al-4V have exhibited a range of grain morphologies depending upon the deposition parameters. These materials have exhibited excellent tensile properties comparable to typical handbook data for wrought plate product after post-processing heat treatments. The EBF3 process is capable of bulk metal deposition at deposition rates in excess of 2500 cubic centimeters per hour (150 in3/hr) or finer detail at lower deposition rates, depending upon the desired application. This process offers the potential for rapidly adding structural details to simpler cast or forged structures rather than the conventional approach of machining large volumes of chips to produce a monolithic metallic structure. Selective addition of metal onto simpler blanks of material can have a significant effect on lead time reduction and lower material and machining costs.

  12. Electron Beam Freeform Fabrication for Cost Effective Near-Net Shape Manufacturing

    NASA Technical Reports Server (NTRS)

    Taminger, Karen M.; Hafley, Robert A.

    2006-01-01

    Manufacturing of structural metal parts directly from computer aided design (CAD) data has been investigated by numerous researchers over the past decade. Researchers at NASA Langley Research Center are developing a new solid freeform fabrication process, electron beam freeform fabrication (EBF3), as a rapid metal deposition process that works efficiently with a variety of weldable alloys. EBF3 deposits of 2219 aluminium and Ti-6Al-4V have exhibited a range of grain morphologies depending upon the deposition parameters. These materials have exhibited excellent tensile properties comparable to typical handbook data for wrought plate product after post-processing heat treatments. The EBF3 process is capable of bulk metal deposition at deposition rates in excess of 2500 cm3/hr (150 in3/hr) or finer detail at lower deposition rates, depending upon the desired application. This process offers the potential for rapidly adding structural details to simpler cast or forged structures rather than the conventional approach of machining large volumes of chips to produce a monolithic metallic structure. Selective addition of metal onto simpler blanks of material can have a significant effect on lead time reduction and lower material and machining costs.

  13. Direct-Write Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Nanosynthesis

    NASA Astrophysics Data System (ADS)

    Ganner, Thomas; Sattelkow, Jürgen; Rumpf, Bernhard; Eibinger, Manuel; Reishofer, David; Winkler, Robert; Nidetzky, Bernd; Spirk, Stefan; Plank, Harald

    2016-09-01

    In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we introduce a new generic technique for the fabrication of polysaccharide nano-structures via focused electron beam induced conversion (FEBIC). For the proof of principle, organosoluble trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on SiO2 / Si and exposed to a nano-sized electron beam. It turns out that in the exposed areas an electron induced desilylation reaction takes place converting soluble TMSC to rather insoluble cellulose. After removal of the unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a generally electron dose dependent behavior with three working regimes: incomplete conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical analyses (enzymatic degradation) confirmed the cellulosic character of ideally converted areas. These investigations are complemented by a theoretical model which suggests a two-step reaction process by means of TMSC → cellulose and cellulose → non-cellulose material conversion in excellent agreement with experimental data. The extracted, individual reaction rates allowed the derivation of design rules for FEBIC parameters towards highest conversion efficiencies and highest lateral resolution.

  14. Direct-Write Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Nanosynthesis

    PubMed Central

    Ganner, Thomas; Sattelkow, Jürgen; Rumpf, Bernhard; Eibinger, Manuel; Reishofer, David; Winkler, Robert; Nidetzky, Bernd; Spirk, Stefan; Plank, Harald

    2016-01-01

    In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we introduce a new generic technique for the fabrication of polysaccharide nano-structures via focused electron beam induced conversion (FEBIC). For the proof of principle, organosoluble trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on SiO2 / Si and exposed to a nano-sized electron beam. It turns out that in the exposed areas an electron induced desilylation reaction takes place converting soluble TMSC to rather insoluble cellulose. After removal of the unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a generally electron dose dependent behavior with three working regimes: incomplete conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical analyses (enzymatic degradation) confirmed the cellulosic character of ideally converted areas. These investigations are complemented by a theoretical model which suggests a two-step reaction process by means of TMSC → cellulose and cellulose → non-cellulose material conversion in excellent agreement with experimental data. The extracted, individual reaction rates allowed the derivation of design rules for FEBIC parameters towards highest conversion efficiencies and highest lateral resolution. PMID:27585861

  15. Study of plasma natural convection induced by electron beam in atmosphere [

    SciTech Connect

    Deng, Yongfeng Han, Xianwei; Tan, Yonghua

    2014-06-15

    Using high-energy electron beams to ionize air is an effective way to produce a large-size plasma in the atmosphere. In particular, with a steady-state high power generator, some unique phenomena can be achieved, including natural convection of the plasma. The characteristics of this convection are studied both experimentally and numerically. The results show that an asymmetrical temperature field develops with magnitudes that vary from 295 K to 389 K at a pressure of 100 Torr. Natural convection is greatly enhanced under 760 Torr. Nevertheless, plasma transport is negligible in this convection flow field and only the plasma core tends to move upward. Parameter analysis is performed to discern influencing factors on this phenomenon. The beam current, reflecting the Rayleigh number Ra effect, correlates with convection intensity, which indicates that energy deposition is the underlying key factor in determining such convections. Finally, natural convection is concluded to be an intrinsic property of the electron beam when focused into dense air, and can be achieved by carefully adjusting equipment operations parameters.

  16. Direct-Write Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Nanosynthesis.

    PubMed

    Ganner, Thomas; Sattelkow, Jürgen; Rumpf, Bernhard; Eibinger, Manuel; Reishofer, David; Winkler, Robert; Nidetzky, Bernd; Spirk, Stefan; Plank, Harald

    2016-01-01

    In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we introduce a new generic technique for the fabrication of polysaccharide nano-structures via focused electron beam induced conversion (FEBIC). For the proof of principle, organosoluble trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on SiO2 / Si and exposed to a nano-sized electron beam. It turns out that in the exposed areas an electron induced desilylation reaction takes place converting soluble TMSC to rather insoluble cellulose. After removal of the unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a generally electron dose dependent behavior with three working regimes: incomplete conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical analyses (enzymatic degradation) confirmed the cellulosic character of ideally converted areas. These investigations are complemented by a theoretical model which suggests a two-step reaction process by means of TMSC → cellulose and cellulose → non-cellulose material conversion in excellent agreement with experimental data. The extracted, individual reaction rates allowed the derivation of design rules for FEBIC parameters towards highest conversion efficiencies and highest lateral resolution. PMID:27585861

  17. High performance Si immersion gratings patterned with electron beam lithography

    NASA Astrophysics Data System (ADS)

    Gully-Santiago, Michael A.; Jaffe, Daniel T.; Brooks, Cynthia B.; Wilson, Daniel W.; Muller, Richard E.

    2014-07-01

    Infrared spectrographs employing silicon immersion gratings can be significantly more compact than spectro- graphs using front-surface gratings. The Si gratings can also offer continuous wavelength coverage at high spectral resolution. The grooves in Si gratings are made with semiconductor lithography techniques, to date almost entirely using contact mask photolithography. Planned near-infrared astronomical spectrographs require either finer groove pitches or higher positional accuracy than standard UV contact mask photolithography can reach. A collaboration between the University of Texas at Austin Silicon Diffractive Optics Group and the Jet Propulsion Laboratory Microdevices Laboratory has experimented with direct writing silicon immersion grating grooves with electron beam lithography. The patterning process involves depositing positive e-beam resist on 1 to 30 mm thick, 100 mm diameter monolithic crystalline silicon substrates. We then use the facility JEOL 9300FS e-beam writer at JPL to produce the linear pattern that defines the gratings. There are three key challenges to produce high-performance e-beam written silicon immersion gratings. (1) E- beam field and subfield stitching boundaries cause periodic cross-hatch structures along the grating grooves. The structures manifest themselves as spectral and spatial dimension ghosts in the diffraction limited point spread function (PSF) of the diffraction grating. In this paper, we show that the effects of e-beam field boundaries must be mitigated. We have significantly reduced ghost power with only minor increases in write time by using four or more field sizes of less than 500 μm. (2) The finite e-beam stage drift and run-out error cause large-scale structure in the wavefront error. We deal with this problem by applying a mark detection loop to check for and correct out minuscule stage drifts. We measure the level and direction of stage drift and show that mark detection reduces peak-to-valley wavefront error

  18. Comparison of the calculated and experimental data of the extracted electron beam profile

    NASA Astrophysics Data System (ADS)

    Miloichikova, I. A.; Povolná, A.; Stuchebrov, S. G.; Naumenko, G. A.

    2015-10-01

    The current commercial use of electron accelerators grows in research, industry, medical diagnosis and treatment. Due to this fact, the creation of a model describing the electron beam profile and shape is an actual task. The model of the TPU microtron extracted electron beam created in the program “Computer Laboratory (PCLab)” is described and compared with experimental results in this article. The value of the internal electron beam divergence determination is illustrated. The experimental data of the electron beam profiles at the selected distances from the output window are analysed and compared with the simulation data. The simulation data of the electron beam profiles are shown.

  19. Continuous Precipitation of Ceria Nanoparticles from a Continuous Flow Micromixer

    SciTech Connect

    Tseng, Chih Heng; Paul, Brian; Chang, Chih-hung; Engelhard, Mark H.

    2013-01-01

    Cerium oxide nanoparticles were continuously precipitated from a solution of cerium(III) nitrate and ammonium hydroxide using a micro-scale T-mixer. Findings show that the method of mixing is important in the ceria precipitation process. In batch mixing and deposition, disintegration and agglomeration dominates the deposited film. In T-mixing and deposition, more uniform nanorod particles are attainable. In addition, it was found that the micromixing approach reduced the exposure of the Ce(OH)3 precipates to oxygen, yielding hydroxide precipates in place of CeO2 precipitates. Advantages of the micro-scale T-mixing approach include shorter mixing times, better control of nanoparticle shape and less agglomeration.

  20. An electron beam imaging system for quality assurance in IORT

    NASA Astrophysics Data System (ADS)

    Casali, F.; Rossi, M.; Morigi, M. P.; Brancaccio, R.; Paltrinieri, E.; Bettuzzi, M.; Romani, D.; Ciocca, M.; Tosi, G.; Ronsivalle, C.; Vignati, M.

    2004-01-01

    Intraoperative radiation therapy is a special radiotherapy technique, which enables a high dose of radiation to be given in a single fraction during oncological surgery. The major stumbling block to the large-scale application of the technique is the transfer of the patient, with an open wound, from the operating room to the radiation therapy bunker, with the consequent organisational problems and the increased risk of infection. To overcome these limitations, in the last few years a new kind of linear accelerator, the Novac 7, conceived for direct use in the surgical room, has become available. Novac 7 can deliver electron beams of different energies (3, 5, 7 and 9 MeV), with a high dose rate (up to 20 Gy/min). The aim of this work, funded by ENEA in the framework of a research contract, is the development of an innovative system for on-line measurements of 2D dose distributions and electron beam characterisation, before radiotherapy treatment with Novac 7. The system is made up of the following components: (a) an electron-light converter; (b) a 14 bit cooled CCD camera; (c) a personal computer with an ad hoc written software for image acquisition and processing. The performances of the prototype have been characterised experimentally with different electron-light converters. Several tests have concerned the assessment of the detector response as a function of impulse number and electron beam energy. Finally, the experimental results concerning beam profiles have been compared with data acquired with other dosimetric techniques. The achieved results make it possible to say that the developed system is suitable for fast quality assurance measurements and verification of 2D dose distributions.