High-cadence observations of CME initiation and plasma dynamics in the corona with TESIS on board CORONAS-Photon

NASA Astrophysics Data System (ADS)

Bogachev, Sergey; Kuzin, Sergey; Zhitnik, I. A.; Bugaenko, O. I.; Goncharov, A. L.; Ignatyev, A. P.; Krutov, V. V.; Lomkova, V. M.; Mitrofanov, A. V.; Nasonkina, T. P.; Oparin, S. N.; Petzov, A. A.; Shestov, S. V.; Slemzin, V. A.; Soloviev, V. A.; Suhodrev, N. K.; Shergina, T. A.

The TESIS is an ensemble of space instruments designed in Lebedev Institute of Russian Academy of Sciences for spectroscopic and imaging investigation of the Sun in EUV and soft X-ray spectral range with high spatial, temporal and spectral resolution. From 2009 January, when TESIS was launched onboard the Coronas-Photon satellite, it provided about 200 000 new images and spectra of the Sun, obtained during one of the deepest solar minimum in last century. Because of the wide field of view (4 solar radii) and high sensitivity, TESIS provided high-quality data on the origin and dynamics of eruptive prominences and CMEs in the low and intermediate solar corona. TESIS is also the first EUV instrument which provided high-cadence observations of coronal bright points and solar spicules with temporal resolution of a few seconds. We present first results of TESIS observations and discuss them from a scientific point of view.

EUV Cross-Calibration Strategies for the GOES-R SUVI

NASA Astrophysics Data System (ADS)

Darnel, Jonathan; Seaton, Daniel

2016-10-01

The challenges of maintaining calibration for solar EUV instrumentation is well-known. The lack of standard calibration sources and the fact that most solar EUV telescopes are incapable of utilizing bright astronomical EUV sources for calibration make knowledge of instrument performance quite difficult. In the recent past, calibration rocket underflights have helped establish a calibration baseline. The EVE instrument on SDO for a time provided well-calibrated, high spectral resolution solar spectra for a broad range of the EUV, but has suffered a loss of coverage at the shorter wavelengths. NOAA's Solar UltraViolet Imager (SUVI), a solar EUV imager with similarities to SDO/AIA, will provide solar imagery over nearly an entire solar cycle. In order to maintain the scientific value of the SUVI's dataset, novel approaches to calibration are necessary. Here we demonstrate a suite of methods to cross-calibrate SUVI against other solar EUV instruments through the use of proxy solar spectra.

An EUV Study of the Eclipsing M-Dwarf Binary System YY GEM

NASA Technical Reports Server (NTRS)

Drake, Jeremy

2000-01-01

EUVE, SW, MW and LW spectra have been reduced and line fluxes measured. The Deep Survey data has been analyzed and light curves have been derived. The spectra around the HE II 304 region show some evidence of emission from the bright A companion star, Castor. Preliminary results for the metallicity of the corona of YY Gem were derived from the EUVE spectra and photometry and were presented at the AAS HEAD meeting; results are being finalized for publication in a referred journal.

The Extreme Ultraviolet Flux of Very Low Mass Stars

NASA Astrophysics Data System (ADS)

Drake, Jeremy

2017-09-01

The X-ray and EUV emission of stars is vital for understanding the atmospheres and evolution of their planets. The coronae of dwarf stars later than M6 behave differently to those of earlier spectral types and are more X-ray dim and radio bright. Too faint to have been observed by EUVE, their EUV behavior is currently highly uncertain. We propose to observe a small sample of late M dwarfs using the off-axis HRC-S thin Al" filter that is sensitive to EUV emission in the 50-200 A range. The measured fluxes will be used to understand the amount of cooler coronal plasma present, and extend X-ray-EUV flux relations to the latest stellar types.

Polar Coronal Hole Ephemeral Regions, the Fast Solar Wind and the Global Magnetic Dynamo

NASA Technical Reports Server (NTRS)

Cirtain, Jonathan W.

2010-01-01

The X-Ray Telescope aboard Hinode has been regularly observing both the north and south solar polar coronal holes from November 2006 through March 2009. We use the observations of emerged flux regions within the coronal hole as evidenced by small x-ray bright points to study the physical properties of these regions. The width of the emerged flux region loop footpoints, the duration of the x-ray emission lifetime for the emerged flux region, the latitude of formation and whether an x-ray or EUV jet was observed were all recorded. In the present work we detail these observations and show a dependence on the width of the emerged flux region (bright point) to the number of x-ray jets observed. The distribution of base width is then related to a power law for number of emerged flux regions as a function of base width.

Solar Radio Burst Associated with the Falling Bright EUV Blob

NASA Astrophysics Data System (ADS)

Karlický, Marian; Zemanová, Alena; Dudík, Jaroslav; Radziszewski, Krzysztof

2018-02-01

At the beginning of the 2015 November 4 flare, in the 1300–2000 MHz frequency range, we observed a very rare slow positively drifting burst. We searched for associated phenomena in simultaneous EUV observations made by IRIS, SDO/AIA, and Hinode/XRT, as well as in H α observations. We found that this radio burst was accompanied with the bright blob, visible at transition region, coronal, and flare temperatures, falling down to the chromosphere along the dark loop with a velocity of about 280 km s‑1. The dark loop was visible in H α but disappeared afterward. Furthermore, we found that the falling blob interacted with the chromosphere as expressed by a sudden change of the H α spectra at the location of this interaction. Considering different possibilities, we propose that the observed slow positively drifting burst is generated by the thermal conduction front formed in front of the falling hot EUV blob.

Extreme Ultraviolet Explorer. Long look at the next window

NASA Technical Reports Server (NTRS)

Maran, Stephen P.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

OH+ emission from cometary knots in planetary nebulae

NASA Astrophysics Data System (ADS)

Priestley, F. D.; Barlow, M. J.

2018-05-01

We model the molecular emission from cometary knots in planetary nebulae (PNe) using a combination of photoionization and photodissociation region (PDR) codes, for a range of central star properties and gas densities. Without the inclusion of ionizing extreme ultraviolet (EUV) radiation, our models require central star temperatures T* to be near the upper limit of the range investigated in order to match observed H2 and OH+ surface brightnesses consistent with observations - with the addition of EUV flux, our models reproduce observed OH+ surface brightnesses for T* ≥ 100 kK. For T* < 80 kK, the predicted OH+ surface brightness is much lower, consistent with the non-detection of this molecule in PNe with such central star temperatures. Our predicted level of H2 emission is somewhat weaker than commonly observed in PNe, which may be resolved by the inclusion of shock heating or fluorescence due to UV photons. Some of our models also predict ArH+ and HeH+ rotational line emission above detection thresholds, despite neither molecule having been detected in PNe, although the inclusion of photodissociation by EUV photons, which is neglected by our models, would be expected to reduce their detectability.

SWAP OBSERVATIONS OF THE LONG-TERM, LARGE-SCALE EVOLUTION OF THE EXTREME-ULTRAVIOLET SOLAR CORONA

DOE Office of Scientific and Technical Information (OSTI.GOV)

Seaton, Daniel B.; De Groof, Anik; Berghmans, David

The Sun Watcher with Active Pixels and Image Processing (SWAP) EUV solar telescope on board the Project for On-Board Autonomy 2 spacecraft has been regularly observing the solar corona in a bandpass near 17.4 nm since 2010 February. With a field of view of 54 × 54 arcmin, SWAP provides the widest-field images of the EUV corona available from the perspective of the Earth. By carefully processing and combining multiple SWAP images, it is possible to produce low-noise composites that reveal the structure of the EUV corona to relatively large heights. A particularly important step in this processing was tomore » remove instrumental stray light from the images by determining and deconvolving SWAP's point-spread function from the observations. In this paper, we use the resulting images to conduct the first-ever study of the evolution of the large-scale structure of the corona observed in the EUV over a three year period that includes the complete rise phase of solar cycle 24. Of particular note is the persistence over many solar rotations of bright, diffuse features composed of open magnetic fields that overlie polar crown filaments and extend to large heights above the solar surface. These features appear to be related to coronal fans, which have previously been observed in white-light coronagraph images and, at low heights, in the EUV. We also discuss the evolution of the corona at different heights above the solar surface and the evolution of the corona over the course of the solar cycle by hemisphere.« less

Temporal and Spatial Variability of the Martian Hot Oxygen Corona

NASA Astrophysics Data System (ADS)

Deighan, J.; Jain, S.; Chaffin, M.; Chaufray, J. Y.; Schneider, N. M.; Clarke, J. T.; Mayyasi, M.; Lillis, R. J.; Eparvier, F. G.; Thiemann, E.; Chamberlin, P. C.

2017-12-01

The dominant loss mechanism of oxygen from Mars to space in the current epoch is thought to be photochemical escape of hot oxygen produced by dissociative recombination of O2+. This ion is ultimately sourced from CO2+, which is the primary product of photoionization. The escaping hot oxygen population is accompanied by a gravitationally bound hot oxygen corona produced by the same mechanism. The MAVEN spacecraft has been at Mars since November 2014, with multiple seasons suitable for the IUVS instrument to observe the dayside hot oxygen corona via fluorescence of the O I 130.4 nm triplet. This provides the opportunity to examine temporal variations associated with changes in the photoionizing solar EUV radiation which produces CO2+ and O2+ ions. We present results based on two seasons: LS = 270 in Mars Year 32 during the maximum of Solar Cycle 24 and LS = 210 in Mars Year 33 late in the declining phase of the same Solar Cycle. The data in both seasons contain multiple solar rotations. We compare the oxygen corona density to the EUV solar flux measured by MAVEN/EUVM and ionization frequencies calculated therefrom. The peak brightness of ionospheric CO2+ UVD emission from IUVS limb scans is also used as a direct indicator of the photoionization frequency. As expected, the result is a strong correlation between solar EUV input, observed ionization frequency, and the density of the hot oxygen corona. In addition, a new observation strategy was employed during the MY 33 season to view the Martian corona near the sub-solar point with anti-parallel lines of sight from opposing hemispheres. These observations reveal a significant hemispherical asymmetry in brightness, providing a constraint on the large scale spatial variability of the dayside oxygen corona.

AWARE - The Automated EUV Wave Analysis and REduction algorithm

NASA Astrophysics Data System (ADS)

Ireland, J.; Inglis; A. R.; Shih, A. Y.; Christe, S.; Mumford, S.; Hayes, L. A.; Thompson, B. J.

2016-10-01

Extreme ultraviolet (EUV) waves are large-scale propagating disturbances observed in the solar corona, frequently associated with coronal mass ejections and flares. Since their discovery over two hundred papers discussing their properties, causes and physics have been published. However, their fundamental nature and the physics of their interactions with other solar phenomena are still not understood. To further the understanding of EUV waves, and their relation to other solar phenomena, we have constructed the Automated Wave Analysis and REduction (AWARE) algorithm for the detection of EUV waves over the full Sun. The AWARE algorithm is based on a novel image processing approach to isolating the bright wavefront of the EUV as it propagates across the corona. AWARE detects the presence of a wavefront, and measures the distance, velocity and acceleration of that wavefront across the Sun. Results from AWARE are compared to results from other algorithms for some well known EUV wave events. Suggestions are also give for further refinements to the basic algorithm presented here.

Ion Traps at the Sun: Implications for Elemental Fractionation

NASA Astrophysics Data System (ADS)

Fleishman, Gregory D.; Musset, Sophie; Bommier, Véronique; Glesener, Lindsay

2018-04-01

Why the tenuous solar outer atmosphere, or corona, is much hotter than the underlying layers remains one of the greatest challenges for solar modeling. Detailed diagnostics of the coronal thermal structure come from extreme ultraviolet (EUV) emission. The EUV emission is produced by heavy ions in various ionization states and depends on the amount of these ions and on plasma temperature and density. Any nonuniformity of the elemental distribution in space or variability in time affects thermal diagnostics of the corona. Here we theoretically predict ionized chemical element concentrations in some areas of the solar atmosphere, where the electric current is directed upward. We then detect these areas observationally, by comparing the electric current density with the EUV brightness in an active region. We found a significant excess in EUV brightness in the areas with positive current density rather than negative. Therefore, we report the observational discovery of substantial concentrations of heavy ions in current-carrying magnetic flux tubes, which might have important implications for the elemental fractionation in the solar corona known as the first ionization potential effect. We call such areas of heavy ion concentration the “ion traps.” These traps hold enhanced ion levels until they are disrupted by a flare, whether large or small.

The Coronal Analysis of SHocks and Waves (CASHeW) framework

NASA Astrophysics Data System (ADS)

Kozarev, Kamen A.; Davey, Alisdair; Kendrick, Alexander; Hammer, Michael; Keith, Celeste

2017-11-01

Coronal bright fronts (CBF) are large-scale wavelike disturbances in the solar corona, related to solar eruptions. They are observed (mostly in extreme ultraviolet (EUV) light) as transient bright fronts of finite width, propagating away from the eruption source location. Recent studies of individual solar eruptive events have used EUV observations of CBFs and metric radio type II burst observations to show the intimate connection between waves in the low corona and coronal mass ejection (CME)-driven shocks. EUV imaging with the atmospheric imaging assembly instrument on the solar dynamics observatory has proven particularly useful for detecting large-scale short-lived CBFs, which, combined with radio and in situ observations, holds great promise for early CME-driven shock characterization capability. This characterization can further be automated, and related to models of particle acceleration to produce estimates of particle fluxes in the corona and in the near Earth environment early in events. We present a framework for the coronal analysis of shocks and waves (CASHeW). It combines analysis of NASA Heliophysics System Observatory data products and relevant data-driven models, into an automated system for the characterization of off-limb coronal waves and shocks and the evaluation of their capability to accelerate solar energetic particles (SEPs). The system utilizes EUV observations and models written in the interactive data language. In addition, it leverages analysis tools from the SolarSoft package of libraries, as well as third party libraries. We have tested the CASHeW framework on a representative list of coronal bright front events. Here we present its features, as well as initial results. With this framework, we hope to contribute to the overall understanding of coronal shock waves, their importance for energetic particle acceleration, as well as to the better ability to forecast SEP events fluxes.

The first Extreme Ultraviolet Explorer source catalog

NASA Technical Reports Server (NTRS)

Bowyer, S.; Lieu, R.; Lampton, M.; Lewis, J.; Wu, X.; Drake, J. J.; Malina, R. F.

1994-01-01

The Extreme Ultraviolet Explorer (EUVE) has conducted an all-sky survey to locate and identify point sources of emission in four extreme ultraviolet wavelength bands centered at approximately 100, 200, 400, and 600 A. A companion deep survey of a strip along half the ecliptic plane was simultaneously conducted. In this catalog we report the sources found in these surveys using rigorously defined criteria uniformly applied to the data set. These are the first surveys to be made in the three longer wavelength bands, and a substantial number of sources were detected in these bands. We present a number of statistical diagnostics of the surveys, including their source counts, their sensitivites, and their positional error distributions. We provide a separate list of those sources reported in the EUVE Bright Source List which did not meet our criteria for inclusion in our primary list. We also provide improved count rate and position estimates for a majority of these sources based on the improved methodology used in this paper. In total, this catalog lists a total of 410 point sources, of which 372 have plausible optical ultraviolet, or X-ray identifications, which are also listed.

CONVERGING SUPERGRANULAR FLOWS AND THE FORMATION OF CORONAL PLUMES

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wang, Y.-M.; Warren, H. P.; Muglach, K., E-mail: yi.wang@nrl.navy.mil, E-mail: harry.warren@nrl.navy.mil, E-mail: karin.muglach@nasa.gov

Earlier studies have suggested that coronal plumes are energized by magnetic reconnection between unipolar flux concentrations and nearby bipoles, even though magnetograms sometimes show very little minority-polarity flux near the footpoints of plumes. Here we use high-resolution extreme-ultraviolet (EUV) images and magnetograms from the Solar Dynamics Observatory (SDO) to clarify the relationship between plume emission and the underlying photospheric field. We find that plumes form where unipolar network elements inside coronal holes converge to form dense clumps, and fade as the clumps disperse again. The converging flows also carry internetwork fields of both polarities. Although the minority-polarity flux is sometimesmore » barely visible in the magnetograms, the corresponding EUV images almost invariably show loop-like features in the core of the plumes, with the fine structure changing on timescales of minutes or less. We conclude that the SDO observations are consistent with a model in which plume emission originates from interchange reconnection in converging flows, with the plume lifetime being determined by the ∼1 day evolutionary timescale of the supergranular network. Furthermore, the presence of large EUV bright points and/or ephemeral regions is not a necessary precondition for the formation of plumes, which can be energized even by the weak, mixed-polarity internetwork fields swept up by converging flows.« less

More Macrospicule Jets in On-Disk Coronal Holes

NASA Astrophysics Data System (ADS)

Adams, Mitzi; Sterling, Alphonse; Moore, Ronald

2015-04-01

We examine the magnetic structure and dynamics of multiple jets found in coronal holes close to or at disk center. All data are from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI) of the Solar Dynamics Observatory (SDO). We report on observations of about ten jets in an equatorial coronal hole spanning 2011 February 27 and 28. We show the evolution of these jets in AIA 193 Å, examine the magnetic field configuration and flux changes in the jet area, and discuss the probable trigger mechanism of these events. We reported on another jet in this same coronal hole on 2011 February 27, ~13:04 UT (Adams et al 2014, ApJ, 783: 11). That jet is a previously unrecognized variety of blowout jet, in which the base-edge bright point is a miniature filament-eruption flare arcade made by internal reconnection of the legs of the erupting field. In contrast, in the presently-accepted "standard" picture for blowout jets, the base-edge bright point is made by interchange reconnection of initially-closed erupting jet-base field with ambient open field. This poster presents further evidence of the production of the base-edge bright point in blowout jets by internal reconnection. Our observations suggest that most of the bigger and brighter EUV jets in coronal holes are blowout jets of the new-found variety.

More Macrospicule Jets in On-Disk Coronal Holes

NASA Technical Reports Server (NTRS)

Adams, M. L.; Sterling, A. C.; Moore, R. L.

2015-01-01

We examine the magnetic structure and dynamics of multiple jets found in coronal holes close to or on disk center. All data are from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI) of the Solar Dynamics Observatory (SDO). We report on observations of about ten jets in an equatorial coronal hole spanning 2011 February 27 and 28. We show the evolution of these jets in AIA 193 A, examine the magnetic field configuration and flux changes in the jet area, and discuss the probable trigger mechanism of these events. We reported on another jet in this same coronal hole on 2011 February 27, (is) approximately 13:04 UT (Adams et al 2014, ApJ, 783: 11). That jet is a previously-unrecognized variety of blowout jet, in which the base-edge bright point is a miniature filament-eruption flare arcade made by internal reconnection of the legs of the erupting field. In contrast, in the presently-accepted 'standard' picture for blowout jets, the base-edge bright point is made by interchange reconnection of initially-closed erupting jet-base field with ambient open field. This poster presents further evidence of the production of the base-edge bright point in blowout jets by internal reconnection. Our observations suggest that most of the bigger and brighter EUV jets in coronal holes are blowout jets of the new-found variety.

Generation of sub-optical-cycle, carrier-envelope-phase--insensitive, extreme-uv pulses via nonlinear stabilization in a waveguide

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sandhu, Arvinder S.; Gagnon, Etienne; Paul, Ariel

2006-12-15

We present evidence for a new regime of high-harmonic generation in a waveguide where bright, sub-optical-cycle, quasimonochromatic, extreme ultraviolet (EUV) light is generated via a mechanism that is relatively insensitive to carrier-envelope phase fluctuations. The interplay between the transient plasma which determines the phase matching conditions and the instantaneous laser intensity which drives harmonic generation gives rise to a new nonlinear stabilization mechanism in the waveguide, localizing the phase-matched EUV emission to within sub-optical-cycle duration. The sub-optical-cycle EUV emission generated by this mechanism can also be selectively optimized in the spectral domain by simple tuning of parameters.

RS CVn binaries: Testing the solar-stellar dynamo connection

NASA Technical Reports Server (NTRS)

Dempsey, R.

1995-01-01

We have used the Extreme Ultraviolet Explorer satellite to study the coronal emission from the EUV-bright RS CVn binaries Sigma2 CrB, observed February 10-21, 1994, and II Peg, observed October 1-5, 1993. We present time-resolved and integrated EUV short-, medium-, and long-wavelength spectra for these binaries. Sigma2 CrB shows significant first-order emission features in the long-wavelength region. The coronal emission distributions and electron densities are estimated for those active coronae dominated by high temperature plasma.

Continued Analysis of EUVE Solar System Observations

NASA Technical Reports Server (NTRS)

Gladstone, G. Randall

2001-01-01

This is the final report for this project. We proposed to continue our work on extracting important results from the EUVE (Extreme UltraViolet Explorer) archive of lunar and jovian system observations. In particular, we planned to: (1) produce several monochromatic images of the Moon at the wavelengths of the brightest solar EUV emission lines; (2) search for evidence of soft X-ray emissions from the Moon and/or X-ray fluorescence at specific EUV wavelengths; (3) search for localized EUV and soft X-ray emissions associated with each of the Galilean satellites; (4) search for correlations between localized Io Plasma Torus (IPT) brightness and volcanic activity on Io; (5) search for soft X-ray emissions from Jupiter; and (6) determine the long term variability of He 58.4 nm emissions from Jupiter, and relate these to solar variability. However, the ADP review panel suggested that the work concentrate on the Jupiter/IPT observations, and provided half the requested funding. Thus we have performed no work on the first two tasks, and instead concentrated on the last three. In addition we used funds from this project to support reduction and analysis of EUVE observations of Venus. While this was not part of the original statement of work, it is entirely in keeping with extracting important results from EUVE solar system observations.

On the Absence of EUV Emission from Comet C/2012 S1 (ISON)

NASA Technical Reports Server (NTRS)

Bryans, Paul; Pesnell, W. Dean

2016-01-01

When the sungrazing comet C2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun's surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This null result is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. By comparing these properties with those of sungrazing comet C2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C2012 S1 (ISON) was at least a factor of four less than that of C2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.

ON THE ABSENCE OF EUV EMISSION FROM COMET C/2012 S1 (ISON)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bryans, Paul; Pesnell, W. Dean

2016-05-10

When the sungrazing comet C/2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun’s surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This “null result” is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. Bymore » comparing these properties with those of sungrazing comet C/2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C/2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C/2012 S1 (ISON) was at least a factor of four less than that of C/2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.« less

Analysis of a Failed Eclipse Plasma Ejection Using EUV Observations

NASA Astrophysics Data System (ADS)

Tavabi, E.; Koutchmy, S.; Bazin, C.

2018-03-01

The photometry of eclipse white-light (W-L) images showing a moving blob is interpreted for the first time together with observations from space with the PRoject for On Board Autonomy (PROBA-2) mission (ESA). An off-limb event seen with great details in W-L was analyzed with the SWAP imager ( Sun Watcher using Active pixel system detector and image Processing) working in the EUV near 174 Å. It is an elongated plasma blob structure of 25 Mm diameter moving above the east limb with coronal loops under. Summed and co-aligned SWAP images are evaluated using a 20-h sequence, in addition to the 11 July, 2010 eclipse W-L images taken from several sites. The Atmospheric Imaging Assembly (AIA) instrument on board the Solar Dynamics Observatory (SDO) recorded the event suggesting a magnetic reconnection near a high neutral point; accordingly, we also call it a magnetic plasmoid. The measured proper motion of the blob shows a velocity up to 12 km s^{-1}. Electron densities of the isolated condensation (cloud or blob or plasmoid) are photometrically evaluated. The typical value is 108 cm^{-3} at r=1.7 R_{⊙}, superposed on a background corona of 107 cm^{-3} density. The mass of the cloud near its maximum brightness is found to be 1.6×10^{13} g, which is typically 0.6×10^{-4} of the overall mass of the corona. From the extrapolated magnetic field the cloud evolves inside a rather broad open region but decelerates, after reaching its maximum brightness. The influence of such small events for supplying material to the ubiquitous slow wind is noticed. A precise evaluation of the EUV photometric data, after accurately removing the stray light, suggests an interpretation of the weak 174 Å radiation of the cloud as due to resonance scattering in the Fe IX/X lines.

Coordinated XTE/EUVE Observations of Algol

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1997-01-01

EUVE, ASCA, and XTE observed the eclipsing binary Algol (Beta Per) from 1-7 Feb. 96. The coordinated observation covered approximately 2 binary orbits of the system, with a net exposure of approximately 160 ksec for EUVE, 40 ksec for ASCA (in 4 pointing), and 90 ksec for XTE (in 45 pointings). We discuss results of modeling the combined EUVE, ASCA, and XTE data using continuous differential emission measure distributions, and provide constraints on the Fe abundance in the Algol system.

Harnessing AIA Diffraction Patterns to Determine Flare Footpoint Temperatures

NASA Astrophysics Data System (ADS)

Bain, H. M.; Schwartz, R. A.; Torre, G.; Krucker, S.; Raftery, C. L.

2014-12-01

In the "Standard Flare Model" energy from accelerated electrons is deposited at the footpoints of newly reconnected flare loops, heating the surrounding plasma. Understanding the relation between the multi-thermal nature of the footpoints and the energy flux from accelerated electrons is therefore fundamental to flare physics. Extreme ultraviolet (EUV) images of bright flare kernels, obtained from the Atmospheric Imaging Assembly (AIA) onboard the Solar Dynamics Observatory, are often saturated despite the implementation of automatic exposure control. These kernels produce diffraction patterns often seen in AIA images during the most energetic flares. We implement an automated image reconstruction procedure, which utilizes diffraction pattern artifacts, to de-saturate AIA images and reconstruct the flare brightness in saturated pixels. Applying this technique to recover the footpoint brightness in each of the AIA EUV passbands, we investigate the footpoint temperature distribution. Using observations from the Ramaty High Energy Solar Spectroscopic Imager (RHESSI), we will characterize the footpoint accelerated electron distribution of the flare. By combining these techniques, we investigate the relation between the nonthermal electron energy flux and the temperature response of the flare footpoints.

Impulsive EUV bursts observed in C IV with OSO-8. [UV solar spectra

NASA Technical Reports Server (NTRS)

Athay, R. G.; White, O. R.; Lites, B. W.; Bruner, E. C., Jr.

1980-01-01

Time sequences of profiles of the 1548 A line of C IV containing 51 EUV bursts observed in or near active regions are analyzed to determine the brightness, Doppler shift and line broadening characteristics of the bursts. The bursts have mean lifetimes of approximately 150 s, and mean increases in brightness at burst maximum of four-fold as observed with a field of view of 2 x 20 arc sec. Mean burst diameters are estimated to be 3 arc sec, or smaller. All but three of the bursts show Doppler shifts with velocities sometimes exceeding 75 km/s; 31 are dominated by red shifts and 17 are dominated by blue shifts. Approximately half of the latter group have red-shifted precursors. The bursts are interpreted as prominence material, such as surges and coronal rain, moving through the field of view of the spectrometer.

The Foggy EUV Corona and Coronal Heating by MHD Waves from Explosive Reconnection Events

NASA Technical Reports Server (NTRS)

Moore, Ron L.; Cirtain, Jonathan W.; Falconer, David A.

2008-01-01

In 0.5 arcsec/pixel TRACE coronal EUV images, the corona rooted in active regions that are at the limb and are not flaring is seen to consist of (1) a complex array of discrete loops and plumes embedded in (2) a diffuse ambient component that shows no fine structure and gradually fades with height. For each of two not-flaring active regions, found that the diffuse component is (1) approximately isothermal and hydrostatic and (2) emits well over half of the total EUV luminosity of the active-region corona. Here, from a TRACE Fe XII coronal image of another not-flaring active region, the large sunspot active region AR 10652 when it was at the west limb on 30 July 2004, we separate the diffuse component from the discrete loop component by spatial filtering, and find that the diffuse component has about 60% of the total luminosity. If under much higher spatial resolution than that of TRACE (e. g., the 0.1 arcsec/pixel resolution of the Hi-C sounding-rocket experiment proposed by J. W. Cirtain et al), most of the diffuse component remains diffuse rather being resolved into very narrow loops and plumes, this will raise the possibility that the EUV corona in active regions consists of two basically different but comparably luminous components: one being the set of discrete bright loops and plumes and the other being a truly diffuse component filling the space between the discrete loops and plumes. This dichotomy would imply that there are two different but comparably powerful coronal heating mechanisms operating in active regions, one for the distinct loops and plumes and another for the diffuse component. We present a scenario in which (1) each discrete bright loop or plume is a flux tube that was recently reconnected in a burst of reconnection, and (2) the diffuse component is heated by MHD waves that are generated by these reconnection events and by other fine-scale explosive reconnection events, most of which occur in and below the base of the corona where they are seen as UV explosive events, EUV blinkers, and type II spicules. These MHD waves propagate across field lines and dissipate, heating the plasma in the field between the bright loops and plumes.

First analysis of solar structures in 1.21 mm full-disc ALMA image of the Sun

NASA Astrophysics Data System (ADS)

Brajša, R.; Sudar, D.; Benz, A. O.; Skokić, I.; Bárta, M.; Pontieu, B. De; Kim, S.; Kobelski, A.; Kuhar, M.; Shimojo, M.; Wedemeyer, S.; White, S.; Yagoubov, P.; Yan, Y.

2018-05-01

Context. Various solar features can be seen in emission or absorption on maps of the Sun in the millimetre and submillimetre wavelength range. The recently installed Atacama Large Millimetre/submillimetre Array (ALMA) is capable of observing the Sun in that wavelength range with an unprecedented spatial, temporal and spectral resolution. To interpret solar observations with ALMA, the first important step is to compare solar ALMA maps with simultaneous images of the Sun recorded in other spectral ranges. Aims: The first aim of the present work is to identify different structures in the solar atmosphere seen in the optical, infrared, and EUV parts of the spectrum (quiet Sun, active regions, prominences on the disc, magnetic inversion lines, coronal holes and coronal bright points) in a full-disc solar ALMA image. The second aim is to measure the intensities (brightness temperatures) of those structures and to compare them with the corresponding quiet Sun level. Methods: A full-disc solar image at 1.21 mm obtained on December 18, 2015, during a CSV-EOC campaign with ALMA is calibrated and compared with full-disc solar images from the same day in Hα line, in He I 1083 nm line core, and with various SDO images (AIA at 170 nm, 30.4 nm, 21.1 nm, 19.3 nm, and 17.1 nm and HMI magnetogram). The brightness temperatures of various structures are determined by averaging over corresponding regions of interest in the calibrated ALMA image. Results: Positions of the quiet Sun, active regions, prominences on the disc, magnetic inversion lines, coronal holes and coronal bright points are identified in the ALMA image. At the wavelength of 1.21 mm, active regions appear as bright areas (but sunspots are dark), while prominences on the disc and coronal holes are not discernible from the quiet Sun background, despite having slightly less intensity than surrounding quiet Sun regions. Magnetic inversion lines appear as large, elongated dark structures and coronal bright points correspond to ALMA bright points. Conclusions: These observational results are in general agreement with sparse earlier measurements at similar wavelengths. The identification of coronal bright points represents the most important new result. By comparing ALMA and other maps, it was found that the ALMA image was oriented properly and that the procedure of overlaying the ALMA image with other images is accurate at the 5 arcsec level. The potential of ALMA for physics of the solar chromosphere is emphasised.

Coordinated ASCA/EUVE/XTE Observations of Algol

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1997-01-01

EUVE, Advanced Satellite for Cosmology and Astrophysics (ASCA), and X-ray Timing Explorer (XTE) observed the eclipsing binary Algol (Beta Per) from 1-7 Feb 1996. The coordinated observation covered approx. 2 binary orbits of the system, with a net exposure of approx. 160 ksec for EUVE, 40 ksec for ASCA (in 4 pointings), and 90 ksec for XTE (in 45 pointings). We discuss results of modeling the combined EUVE, ASCA, and XTE data using continuous differential emission measure distributions, and provide constraints on the abundance in the Algol system.

Sparkling extreme-ultraviolet bright dots observed with Hi-C

DOE Office of Scientific and Technical Information (OSTI.GOV)

Régnier, S.; Alexander, C. E.; Walsh, R. W.

Observing the Sun at high time and spatial scales is a step toward understanding the finest and fundamental scales of heating events in the solar corona. The high-resolution coronal (Hi-C) instrument has provided the highest spatial and temporal resolution images of the solar corona in the EUV wavelength range to date. Hi-C observed an active region on 2012 July 11 that exhibits several interesting features in the EUV line at 193 Å. One of them is the existence of short, small brightenings 'sparkling' at the edge of the active region; we call these EUV bright dots (EBDs). Individual EBDs havemore » a characteristic duration of 25 s with a characteristic length of 680 km. These brightenings are not fully resolved by the SDO/AIA instrument at the same wavelength; however, they can be identified with respect to the Hi-C location of the EBDs. In addition, EBDs are seen in other chromospheric/coronal channels of SDO/AIA, which suggests a temperature between 0.5 and 1.5 MK. Based on their frequency in the Hi-C time series, we define four different categories of EBDs: single peak, double peak, long duration, and bursty. Based on a potential field extrapolation from an SDO/HMI magnetogram, the EBDs appear at the footpoints of large-scale, trans-equatorial coronal loops. The Hi-C observations provide the first evidence of small-scale EUV heating events at the base of these coronal loops, which have a free magnetic energy of the order of 10{sup 26} erg.« less

EUV brightness variations in the quiet Sun

NASA Astrophysics Data System (ADS)

Brković, A.; Rüedi, I.; Solanki, S. K.; Fludra, A.; Harrison, R. A.; Huber, M. C. E.; Stenflo, J. O.; Stucki, K.

2000-01-01

The Coronal Diagnostic Spectrometer (CDS) onboard the SOHO satellite has been used to obtain movies of quiet Sun regions at disc centre. These movies were used to study brightness variations of solar features at three different temperatures sampled simultaneously in the chromospheric He I 584.3 Ä (2 * 104 K), the transition region O V 629.7 Ä (2.5 * 105 K) and coronal Mg IX 368.1 Ä (106 K) lines. In all parts of the quiet Sun, from darkest intranetwork to brightest network, we find significant variability in the He I and O V line, while the variability in the Mg IX line is more marginal. The relative variability, defined by rms of intensity normalised to the local intensity, is independent of brightness and strongest in the transition region line. Thus the relative variability is the same in the network and the intranetwork. More than half of the points on the solar surface show a relative variability, determined over a period of 4 hours, greater than 15.5% for the O V line, but only 5% of the points exhibit a variability above 25%. Most of the variability appears to take place on time-scales between 5 and 80 minutes for the He I and O V lines. Clear signs of ``high variability'' events are found. For these events the variability as a function of time seen in the different lines shows a good correlation. The correlation is higher for more variable events. These events coincide with the (time averaged) brightest points on the solar surface, i.e. they occur in the network. The spatial positions of the most variable points are identical in all the lines.

Flux rope, hyperbolic flux tube, and late extreme ultraviolet phases in a non-eruptive circular-ribbon flare

NASA Astrophysics Data System (ADS)

Masson, Sophie; Pariat, Étienne; Valori, Gherardo; Deng, Na; Liu, Chang; Wang, Haimin; Reid, Hamish

2017-08-01

Context. The dynamics of ultraviolet (UV) emissions during solar flares provides constraints on the physical mechanisms involved in the trigger and the evolution of flares. In particular it provides some information on the location of the reconnection sites and the associated magnetic fluxes. In this respect, confined flares are far less understood than eruptive flares generating coronal mass ejections. Aims: We present a detailed study of a confined circular flare dynamics associated with three UV late phases in order to understand more precisely which topological elements are present and how they constrain the dynamics of the flare. Methods: We perform a non-linear force-free field extrapolation of the confined flare observed with the Helioseismic and Magnetic Imager (HMI) and Atmospheric Imaging Assembly (AIA) instruments on board Solar Dynamics Observatory (SDO). From the 3D magnetic field we compute the squashing factor and we analyse its distribution. Conjointly, we analyse the AIA extreme ultraviolet (EUV) light curves and images in order to identify the post-flare loops, and their temporal and thermal evolution. By combining the two analyses we are able to propose a detailed scenario that explains the dynamics of the flare. Results: Our topological analysis shows that in addition to a null-point topology with the fan separatrix, the spine lines and its surrounding quasi-separatix layer (QSL) halo (typical for a circular flare), a flux rope and its hyperbolic flux tube (HFT) are enclosed below the null. By comparing the magnetic field topology and the EUV post-flare loops we obtain an almost perfect match between the footpoints of the separatrices and the EUV 1600 Å ribbons and between the HFT field line footpoints and bright spots observed inside the circular ribbons. We show, for the first time in a confined flare, that magnetic reconnection occurred initially at the HFT below the flux rope. Reconnection at the null point between the flux rope and the overlying field is only initiated in a second phase. In addition, we showed that the EUV late phase observed after the main flare episode is caused by the cooling loops of different length which have all reconnected at the null point during the impulsive phase. Conclusions: Our analysis shows in one example that flux ropes are present in null-point topology not only for eruptive and jet events, but also for confined flares. This allows us to conjecture on the analogies between conditions that govern the generation of jets, confined flares or eruptive flares. A movie is available at http://www.aanda.org

Extreme Ultraviolet Variability Experiment (EVE) on the Solar Dynamics Observatory (SDO): Overview of Science Objectives, Instrument Design, Data Products, and Model Developments

NASA Technical Reports Server (NTRS)

Woods, T. N.; Eparvier, F. G.; Hock, R.; Jones, A. R.; Woodraska, D.; Judge, D.; Didkovsky, L.; Lean, J.; Mariska, J.; Warren, H.;

EUV Waves Driven by the Sudden Expansion of Transequatorial Loops Caused by Coronal Jets

NASA Astrophysics Data System (ADS)

Shen, Yuandeng; Tang, Zehao; Miao, Yuhu; Su, Jiangtao; Liu, Yu

2018-06-01

We present two events to study the driving mechanism of extreme-ultraviolet (EUV) waves that are not associated with coronal mass ejections (CMEs), by using high-resolution observations taken by the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Observational results indicate that the observed EUV waves were accompanied by flares and coronal jets, but not the CMEs that were regarded as drivers of most EUV waves in previous studies. In the first case, it is observed that a coronal jet is ejected along a transequatorial loop system at a plane-of-the-sky (POS) speed of 335 ± 22 km s{}-1; in the meantime, an arc-shaped EUV wave appeared on the eastern side of the loop system. In addition, the EUV wave further interacted with another interconnecting loop system and launched a fast propagating (QFP) magnetosonic wave along the loop system, which had a period of 200 s and a speed of 388 ± 65 km s{}-1, respectively. In the second case, we observed a coronal jet that ejected at a POS speed of 282 ± 44 km s{}-1 along a transequatorial loop system as well as the generation of bright EUV waves on the eastern side of the loop system. Based on the observational results, we propose that the observed EUV waves on the eastern side of the transequatorial loop systems are fast-mode magnetosonic waves and that they are driven by the sudden lateral expansion of the transequatorial loop systems due to the direct impingement of the associated coronal jets, while the QFP wave in the fist case formed due to the dispersive evolution of the disturbance caused by the interaction between the EUV wave and the interconnecting coronal loops. It is noted that EUV waves driven by sudden loop expansions have shorter lifetimes than those driven by CMEs.

The 830--1120 A Spectrum of a Bright Comet: First Results on Hale-Bopp

NASA Astrophysics Data System (ADS)

Stern, S. Alan; Festou, Michel C.; Slater, David C.; Parker, Joel Wm.; A'Hearn, Michael F.

1998-09-01

The EUVS planetary sounding rocket spectrograph was flown on 29 March 1997 from White Sands, New Mexico to observe comet Hale-Bopp in the bandpass from 830--1120 Angstroms. At the time of launch the comet was near perihelion, 0.92 AU from the Sun, 1.34 AU from Earth, and traveling at a heliocentric radial velocity of +0.70 km/s. EUVS obtained its primary spectra of the comet at resolution near 3 Angstroms, collecting 9340 counts over approximately 330 seconds of integration time. To our knowledge, the resulting dataset is both the most sensitive and the highest spectral resolution probe of a comet in the UV below 1200 Angstroms yet achieved. The spectrum includes significant detections which we tentatively attribute to due to 834 Angstroms 0 II, the 1026 Angstroms H I Lyman beta /O I blend, and 989 Angstroms O I; we will also discuss evidence for Argon signatures, as well as two additional, yet to be identified features. We will describe the EUVS Hale-Bopp experiment and its results, including feature brightnesses, corresponding columns, and species abundance ratios in the inner coma. In addition to its value for providing insight into comets in general, and Hale-Bopp in particular, this spectrum is serving as an excellent input for New Millennium Deep Space 1/MICAS and Rosetta/ALICE UV observation planning below 1200 Angstroms.

Solar Cycle Variation of Microwave Polar Brightening and EUV Coronal Hole Observed by Nobeyama Radioheliograph and SDO/AIA

NASA Astrophysics Data System (ADS)

Kim, Sujin; Park, Jong-Yeop; Kim, Yeon-Han

2017-08-01

We investigate the solar cycle variation of microwave and extreme ultraviolet (EUV) intensity in latitude to compare microwave polar brightening (MPB) with the EUV polar coronal hole (CH). For this study, we used the full-sun images observed in 17 GHz of the Nobeyama Radioheliograph from 1992 July to 2016 November and in two EUV channels of the Atmospheric Imaging Assembly (AIA) 193 Å and 171 Å on the Solar Dynamics Observatory (SDO) from 2011 January to 2016 November. As a result, we found that the polar intensity in EUV is anti-correlated with the polar intensity in microwave. Since the depression of EUV intensity in the pole is mostly owing to the CH appearance and continuation there, the anti-correlation in the intensity implies the intimate association between the polar CH and the MPB. Considering the report of tet{gopal99} that the enhanced microwave brightness in the CH is seen above the enhanced photospheric magnetic field, we suggest that the pole area during the solar minimum has a stronger magnetic field than the quiet sun level and such a strong field in the pole results in the formation of the polar CH. The emission mechanism of the MPB and the physical link with the polar CH are not still fully understood. It is necessary to investigate the MPB using high resolution microwave imaging data, which can be obtained by the high performance large-array radio observatories such as the ALMA project.

A Sounding Rocket Mission Concept to Acquire High-Resolution Radiometric Spectra Spanning the 9 nm - 31 nm Wavelength Range

NASA Technical Reports Server (NTRS)

Krause, L. Habash; Cirtain, Jonathan; McGuirck, Michael; Pavelitz, Steven; Weber, Ed.; Winebarger, Amy

2012-01-01

When studying Solar Extreme Ultraviolet (EUV) emissions, both single-wavelength, two- dimensional (2D) spectroheliograms and multi-wavelength, one-dimensional (1D) line spectra are important, especially for a thorough understanding of the complex processes in the solar magnetized plasma from the base of the chromosphere through the corona. 2D image data are required for a detailed study of spatial structures, whereas radiometric (i.e., spectral) data provide information on relevant atomic excitation/ionization state densities (and thus temperature). Using both imaging and radiometric techniques, several satellite missions presently study solar dynamics in the EUV, including the Solar Dynamics Observatory (SDO), Hinode, and the Solar-Terrestrial Relations Observatory (STEREO). The EUV wavelengths of interest typically span 9 nm to 31 nm, with the shorter wavelengths being associated with the hottest features (e.g., intense flares and bright points) and the longer wavelengths associated with cooler features (e.g., coronal holes and filaments). Because the optical components of satellite instruments degrade over time, it is not uncommon to conduct sounding rocket underflights for calibration purposes. The authors have designed a radiometric sounding rocket payload that could serve as both a calibration underflight for and a complementary scientific mission to the upcoming Solar Ultraviolet Imager (SUVI) mission aboard the GOES-R satellite (scheduled for a 2015 launch). The challenge to provide quality radiometric line spectra over the 9-31 nm range covered by SUVI was driven by the multilayer coatings required to make the optical components, including mirrors and gratings, reflective over the entire range. Typically, these multilayers provide useful EUV reflectances over bandwidths of a few nm. Our solution to this problem was to employ a three-telescope system in which the optical components were coated with multilayers that spanned three wavelength ranges to cover the three pairs of SUVI bands. The complete system was designed to fit within the Black Brandt-IX 22.-diameter payload skin envelope. The basic optical path is that of a simple parabolic telescope in which EUV light is focused onto a slit and shutter assembly and imaged onto a normal-incidence diffraction grating, which then disperses the light onto a 2048 2048 CCD sensor. The CCD thus records 1D spatial information along one axis and spectral information along the other. The slit spans 40 arc-minutes in length, thus covering a solar diameter out to +/- 1.3 solar radii. Our operations concept includes imaging at three distinct positions: the north-south meridian, the northeast-southwest diagonal, and real-time pointing at an active region. Six 10-second images will be obtained at each position. Fine pointing is provided by the SPARCS-VII attitude control system typically employed on Black Brandt solar missions. Both before and after launch, all three telescopes will be calibrated with the EUV line emission source and monochromater system at NASA's Stray Light Facility at Marshall Spaceflight Center. Details of the payload design, operations concept, and data application will be presented.

Solar Dynamics Observatory Lessons Learned

NASA Technical Reports Server (NTRS)

Rivera, Rachel; Uhl, Andrew; Secunda, Mark

2010-01-01

Mission is to study how solar activity is created and how space weather results from that activity. Atmospheric Imaging Assembly (AIA): High Resolution Images of 10 wavelengths every 10 seconds. Extreme Ultraviolet Variability Experiment (EVE): Measure Sun's brightness in EUV. Helioseismic and Magnetic Imager (HMI): Measures Doppler shift to study waves of the Sun. Launched February 11, 2010.

Hinode observations and 3D magnetic structure of an X-ray bright point

NASA Astrophysics Data System (ADS)

Alexander, C. E.; Del Zanna, G.; Maclean, R. C.

2011-02-01

Aims: We present complete Hinode Solar Optical Telescope (SOT), X-Ray Telescope (XRT)and EUV Imaging Spectrometer (EIS) observations of an X-ray bright point (XBP) observed on the 10, 11 of October 2007 over its entire lifetime (~12 h). We aim to show how the measured plasma parameters of the XBP change over time and also what kind of similarities the X-ray emission has to a potential magnetic field model. Methods: Information from all three instruments on-board Hinode was used to study its entire evolution. XRT data was used to investigate the structure of the bright point and to measure the X-ray emission. The EIS instrument was used to measure various plasma parameters over the entire lifetime of the XBP. Lastly, the SOT was used to measure the magnetic field strength and provide a basis for potential field extrapolations of the photospheric fields to be made. These were performed and then compared to the observed coronal features. Results: The XBP measured ~15´´ in size and was found to be formed directly above an area of merging and cancelling magnetic flux on the photosphere. A good correlation between the rate of X-ray emission and decrease in total magnetic flux was found. The magnetic fragments of the XBP were found to vary on very short timescales (minutes), however the global quasi-bipolar structure remained throughout the lifetime of the XBP. The potential field extrapolations were a good visual fit to the observed coronal loops in most cases, meaning that the magnetic field was not too far from a potential state. Electron density measurements were obtained using a line ratio of Fe XII and the average density was found to be 4.95 × 109 cm-3 with the volumetric plasma filling factor calculated to have an average value of 0.04. Emission measure loci plots were then used to infer a steady temperature of log Te [ K] ~ 6.1. The calculated Fe XII Doppler shifts show velocity changes in and around the bright point of ±15 km s-1 which are observed to change on a timescale of less than 30 min.

A Tidal Disruption Event in a Nearby Galaxy Hosting an Intermediate Mass Black Hole

NASA Technical Reports Server (NTRS)

Donato, D; Cenko, S. B.; Covino, S.; Troja, E.; Pursimo, T.; Cheung, C. C.; Fox, O.; Kutyrev, A.; Campana, S.; Fugazza, D.;

Solar Coronal Jets Extending to High Altitudes Observed during the 2017 August 21 Total Eclipse

NASA Astrophysics Data System (ADS)

Hanaoka, Yoichiro; Hasuo, Ryuichi; Hirose, Tsukasa; Ikeda, Akiko C.; Ishibashi, Tsutomu; Manago, Norihiro; Masuda, Yukio; Morita, Sakuhiro; Nakazawa, Jun; Ohgoe, Osamu; Sakai, Yoshiaki; Sasaki, Kazuhiro; Takahashi, Koichi; Toi, Toshiyuki

2018-06-01

Coronal jets, which extend from the solar surface to beyond 2 R ⊙, were observed in the polar coronal hole regions during the total solar eclipse on 2017 August 21. In a time-series of white-light images of the corona spanning 70 minutes taken with our multi-site observations of this eclipse, six jets were found as narrow structures upwardly ejected with an apparent speed of about 450 km s‑1 in polar plumes. On the other hand, extreme-ultraviolet (EUV) images taken with the Atmospheric Image Assembly of the Solar Dynamics Observatory show that all of the eclipse jets were preceded by EUV jets. Conversely, all the EUV jets whose brightnesses are comparable to ordinary soft X-ray jets and that occurred in the polar regions near the eclipse period, were observed as eclipse jets. These results suggest that ordinary polar jets generally reach high altitudes and escape from the Sun as part of the solar wind.

Static and Impulsive Models of Solar Active Regions

NASA Technical Reports Server (NTRS)

Patsourakos, S.; Klimchuk, James A.

2008-01-01

The physical modeling of active regions (ARs) and of the global coronal is receiving increasing interest lately. Recent attempts to model ARs using static equilibrium models were quite successful in reproducing AR images of hot soft X-ray (SXR) loops. They however failed to predict the bright EUV warm loops permeating ARs: the synthetic images were dominated by intense footpoint emission. We demonstrate that this failure is due to the very weak dependence of loop temperature on loop length which cannot simultaneously account for both hot and warm loops in the same AR. We then consider time-dependent AR models based on nanoflare heating. We demonstrate that such models can simultaneously reproduce EUV and SXR loops in ARs. Moreover, they predict radial intensity variations consistent with the localized core and extended emissions in SXR and EUV AR observations respectively. We finally show how the AR morphology can be used as a gauge of the properties (duration, energy, spatial dependence, repetition time) of the impulsive heating.

Tomographic reconstruction of circularly polarized high-harmonic fields: 3D attosecond metrology

PubMed Central

Chen, Cong; Tao, Zhensheng; Hernández-García, Carlos; Matyba, Piotr; Carr, Adra; Knut, Ronny; Kfir, Ofer; Zusin, Dimitry; Gentry, Christian; Grychtol, Patrik; Cohen, Oren; Plaja, Luis; Becker, Andreas; Jaron-Becker, Agnieszka; Kapteyn, Henry; Murnane, Margaret

2016-01-01

Bright, circularly polarized, extreme ultraviolet (EUV) and soft x-ray high-harmonic beams can now be produced using counter-rotating circularly polarized driving laser fields. Although the resulting circularly polarized harmonics consist of relatively simple pairs of peaks in the spectral domain, in the time domain, the field is predicted to emerge as a complex series of rotating linearly polarized bursts, varying rapidly in amplitude, frequency, and polarization. We extend attosecond metrology techniques to circularly polarized light by simultaneously irradiating a copper surface with circularly polarized high-harmonic and linearly polarized infrared laser fields. The resulting temporal modulation of the photoelectron spectra carries essential phase information about the EUV field. Utilizing the polarization selectivity of the solid surface and by rotating the circularly polarized EUV field in space, we fully retrieve the amplitude and phase of the circularly polarized harmonics, allowing us to reconstruct one of the most complex coherent light fields produced to date. PMID:26989782

EUV spectroscopy in astrophysics: The role of compact objects

NASA Astrophysics Data System (ADS)

Wood, K. S.; Kowalski, M. P.; Cruddace, R. G.; Barstow, M. A.

2006-01-01

The bulk of radiation from million-degree plasmas is emitted at EUV wavelengths. Such plasmas are ubiquitous in astrophysics, and examples include the atmospheres of white dwarfs, accretion phenomena in cataclysmic variables (CVs) and some active galactic nuclei (AGN), the coronae of active stars, and the interstellar medium (ISM) of our own galaxy as well as of others. Internally, white dwarfs are formally analogous to neutron stars, being stellar configurations where the thermal contribution to support is secondary. Both stellar types have various intrinsic and environmental parameters. Comparison of such analogous systems using scaled parameters can be fruitful. Source class characterization is mature enough that such analogies can be used to compare theoretical ideas across a wide dynamic range in parameters, one example being theories of quasiperiodic oscillations. However, the white dwarf side of this program is limited by the available photometry and spectroscopy at EUV wavelengths, where there exist critical spectral features that contain diagnostic information often not available at other wavelengths. Moreover, interstellar absorption makes EUV observations challenging. Results from an observation of the hot white dwarf G191-B2B are presented to demonstrate the promise of high-resolution EUV spectroscopy. Two types of CVs, exemplified by AM Her and EX Hya, are used to illustrate blending of spectroscopy and timing measurements. Dynamical timescales and envisioned performance parameters of next-generation EUV satellites (effective area >20 cm 2, spectral resolution >10,000) make possible a new level of source modeling. The importance of the EUV cannot be overlooked given that observations are continually being pushed to cosmological distances, where the spectral energy distributions of X-ray bright AGNs, for example, will have their maxima redshifted into the EUV. Sometimes wrongly dismissed for limitations of small bandwidth or local view from optical depth limitations, the EUV is instead a gold mine of information bearing upon key issues in compact objects, but it is information that must be won through the triple combination of high-spectral resolution, large area, and application of advanced theory.

Time-Resolved Spectroscopy of Active Binary Stars

NASA Technical Reports Server (NTRS)

Brown, Alexander

2000-01-01

This NASA grant covered EUVE observing and data analysis programs during EUVE Cycle 5 GO observing. The research involved a single Guest Observer project 97-EUVE-061 "Time-Resolved Spectroscopy of Active Binary Stars". The grant provided funding that covered 1.25 months of the PI's salary. The activities undertaken included observation planning and data analysis (both temporal and spectral). This project was awarded 910 ksec of observing time to study seven active binary stars, all but one of which were actually observed. Lambda-And was observed on 1997 Jul 30 - Aug 3 and Aug 7-14 for a total of 297 ksec; these observations showed two large complex flares that were analyzed by Osten & Brown (1999). AR Psc, observed for 350 ksec on 1997 Aug 27 - Sep 13, showed only relatively small flares that were also discussed by Osten & Brown (1999). EUVE observations of El Eri were obtained on 1994 August 24-28, simultaneous with ASCA X-ray spectra. Four flares were detected by EUVE with one of these also observed simultaneously, by ASCA. The other three EUVE observations were of the stars BY Dra (1997 Sep 22-28), V478 Lyr (1998 May 18-27), and sigma Gem (1998 Dec 10-22). The first two stars showed a few small flares. The sigma Gem data shows a beautiful complete flare with a factor of ten peak brightness compared to quiescence. The flare rise and almost all the decay phase are observed. Unfortunately no observations in other spectral regions were obtained for these stars. Analysis of the lambda-And and AR Psc observations is complete and the results were published in Osten & Brown (1999). Analysis of the BY Dra, V478 Lyr and sigma Gem EUVE data is complete and will be published in Osten (2000, in prep.). The El Eri EUV analysis is also completed and the simultaneous EUV/X-ray study will be published in Osten et al. (2000, in prep.). Both these latter papers will be submitted in summer 2000. All these results will form part of Rachel Osten's PhD thesis.

Anti­-parallel Filament Flows and Bright Dots Observed in the EUV with Hi-­C

NASA Technical Reports Server (NTRS)

Alexander, Caroline E.; Regnier, Stephane; Walsh, Robert; Winebarger, Amy

2013-01-01

Hi-C obtained the highest spatial and temporal resolution observations ever taken in the solar EUV corona. Hi-C reveals dynamics and structure at the limit of its temporal and spatial resolution. Hi-C observed various fine-scale features that SDO/AIA could not pick out. For the first time in the corona, Hi-C revealed magnetic braiding and component reconnection consistent with coronal heating. Hi-C shows evidence of reconnection and heating in several different regions and magnetic configurations with plasma being heated to 0.3 - 8 x 10(exp 6) K temperatures. Surprisingly, many of the first results highlight plasma at temperatures that are not at the peak of the response functions.

Proper horizontal photospheric flows in a filament channel

NASA Astrophysics Data System (ADS)

Schmieder, B.; Roudier, T.; Mein, N.; Mein, P.; Malherbe, J. M.; Chandra, R.

2014-04-01

Context. An extended filament in the central part of the active region NOAA 11106 crossed the central meridian on Sept. 17, 2010 in the southern hemisphere. It has been observed in Hα with the THEMIS telescope in the Canary Islands and in 304 Å with the EUV imager (AIA) onboard the Solar Dynamic Observatory (SDO). Counterstreaming along the Hα threads and bright moving blobs (jets) along the 304 Å filament channel were observed during 10 h before the filament erupted at 17:03 UT. Aims: The aim of the paper is to understand the coupling between magnetic field and convection in filament channels and relate the horizontal photospheric motions to the activity of the filament. Methods: An analysis of the proper photospheric motions using SDO/HMI continuum images with the new version of the coherent structure tracking (CST) algorithm developed to track granules, as well as the large scale photospheric flows, was performed for three hours. Using corks, we derived the passive scalar points and produced a map of the cork distribution in the filament channel. Averaging the velocity vectors in the southern hemisphere in each latitude in steps of 3.5 arcsec, we defined a profile of the differential rotation. Results: Supergranules are clearly identified in the filament channel. Diverging flows inside the supergranules are similar in and out of the filament channel. Converging flows corresponding to the accumulation of corks are identified well around the Hα filament feet and at the edges of the EUV filament channel. At these convergence points, the horizontal photospheric velocity may reach 1 km s-1, but with a mean velocity of 0.35 km s-1. In some locations, horizontal flows crossing the channel are detected, indicating eventually large scale vorticity. Conclusions: The coupling between convection and magnetic field in the photosphere is relatively strong. The filament experienced the convection motions through its anchorage points with the photosphere, which are magnetized areas (ends, feet, lateral extensions of the EUV filament channel). From a large scale point-of-view, the differential rotation induced a shear of 0.1 km s-1 in the filament. From a small scale point-of-view, any convective motions favored the interaction of the parasitic polarities responsible for the anchorages of the filament to the photosphere with the surrounding network and may explain the activity of the filament. Two movies are available in electronic form at http://www.aanda.org

Spectroscopic Study of a Dark Lane and a Cool Loop in a Solar Limb Active Region by Hinode/EIS

NASA Astrophysics Data System (ADS)

Lee, Kyoung-Sun; Imada, S.; Moon, Y.-J.; Lee, Jin-Yi

2014-01-01

We investigated a cool loop and a dark lane over a limb active region on 2007 March 14 using the Hinode/EUV Imaging Spectrometer. The cool loop is clearly seen in the spectral lines formed at the transition region temperature. The dark lane is characterized by an elongated faint structure in the coronal spectral lines and is rooted on a bright point. We examined their electron densities, Doppler velocities, and nonthermal velocities as a function of distance from the limb. We derived electron densities using the density sensitive line pairs of Mg VII, Si X, Fe XII, Fe XIII, and Fe XIV spectra. We also compared the observed density scale heights with the calculated scale heights from each peak formation temperatures of the spectral lines under the hydrostatic equilibrium. We noted that the observed density scale heights of the cool loop are consistent with the calculated heights, with the exception of one observed cooler temperature; we also found that the observed scale heights of the dark lane are much lower than their calculated scale heights. The nonthermal velocity in the cool loop slightly decreases along the loop, while nonthermal velocity in the dark lane sharply falls off with height. Such a decrease in the nonthermal velocity may be explained by wave damping near the solar surface or by turbulence due to magnetic reconnection near the bright point.

Quasi-periodic Oscillation of a Coronal Bright Point

NASA Astrophysics Data System (ADS)

Samanta, Tanmoy; Banerjee, Dipankar; Tian, Hui

2015-06-01

Coronal bright points (BPs) are small-scale luminous features seen in the solar corona. Quasi-periodic brightenings are frequently observed in the BPs and are generally linked with underlying magnetic flux changes. We study the dynamics of a BP seen in the coronal hole using the Atmospheric Imaging Assembly images, the Helioseismic and Magnetic Imager magnetogram on board the Solar Dynamics Observatory, and spectroscopic data from the newly launched Interface Region Imaging Spectrograph (IRIS). The detailed analysis shows that the BP evolves throughout our observing period along with changes in underlying photospheric magnetic flux and shows periodic brightenings in different EUV and far-UV images. With the highest possible spectral and spatial resolution of IRIS, we attempted to identify the sources of these oscillations. IRIS sit-and-stare observation provided a unique opportunity to study the time evolution of one footpoint of the BP as the slit position crossed it. We noticed enhanced line profile asymmetry, enhanced line width, intensity enhancements, and large deviation from the average Doppler shift in the line profiles at specific instances, which indicate the presence of sudden flows along the line-of-sight direction. We propose that transition region explosive events originating from small-scale reconnections and the reconnection outflows are affecting the line profiles. The correlation between all these parameters is consistent with the repetitive reconnection scenario and could explain the quasi-periodic nature of the brightening.

Source of Quasi-Periodic Brightenings of Solar Coronal Bright Points: Waves or Repeated Reconnections

NASA Astrophysics Data System (ADS)

Samanta, Tanmoy; Tian, Hui; Banerjee, Dipankar

2016-07-01

Coronal bright points (BPs) are small-scale luminous features seen in the solar corona. Quasi-periodic brightenings are frequently observed in the BPs and are generally linked with underlying magnetic flux changes. We study the dynamics of a BP seen in the coronal hole using the Atmospheric Imaging Assembly images, the Helioseismic and Magnetic Imager magnetogram on board the Solar Dynamics Observatory, and spectroscopic data from the newly launched Interface Region Imaging Spectrograph (IRIS). The detailed analysis shows that the BP evolves throughout our observing period along with changes in underlying photospheric magnetic flux and shows periodic brightenings in different EUV and far-UV images. With the highest possible spectral and spatial resolution of IRIS, we attempted to identify the sources of these oscillations. IRIS sit-and-stare observation provided a unique opportunity to study the time evolution of one footpoint of the BP as the slit position crossed it. We noticed enhanced line profile asymmetry, enhanced line width, intensity enhancements, and large deviation from the average Doppler shift in the line profiles at specific instances, which indicate the presence of sudden flows along the line-of-sight direction. We propose that transition region explosive events originating from small-scale reconnections and the reconnection outflows are affecting the line profiles. The correlation between all these parameters is consistent with the repetitive reconnection scenario and could explain the quasi-periodic nature of the brightening.

High-Resolution EUV Spectroscopy of White Dwarfs

NASA Astrophysics Data System (ADS)

Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

2014-01-01

We compare results of high-resolution EUV spectroscopic measurements of the isolated white dwarf G191-B2B and the binary system Feige 24 obtained with the J-PEX (Joint Plasmadynamic Experiment), which was sponsored jointly by the U.S. Naval Research Laboratory and NASA. J-PEX delivers the world's highest resolution in EUV and does so at high effective area (e.g., more effective area in a sounding rocket than is available with Chandra at adjacent energies, but in a waveband Chandra cannot reach). The capability J-PEX represents is applicable to the astrophysics of hot plasmas in stellar coronae, white dwarfs and the ISM. G191-B2B and Feige 24 are quite distinct hot white dwarf systems having in common that they are bright in the portion of the EUV where He emission features and edges occur, hence they can be exploited to probe both the stellar atmosphere and the ISM, separating those components by model-fitting that sums over all relevant (He) spectral features in the band. There is evidence from these fits that atmospheric He is being detected but the result is more conservatively cast as a pair of upper limits. We discuss how longer duration satellite observations with the same instrumentation could increase exposure to detect atmospheric He in these and other nearby hot white dwarfs.

Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model

PubMed Central

Su, M. G.; Min, Q.; Cao, S. Q.; Sun, D. X.; Hayden, P.; O’Sullivan, G.; Dong, C. Z.

2017-01-01

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging. PMID:28332621

Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

NASA Technical Reports Server (NTRS)

Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

1994-01-01

We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

Simultaneous ASCA and EUVE Observations of Capella

NASA Astrophysics Data System (ADS)

Brickhouse, N. S.; Dupree, A. K.; Edgar, R. J.; Drake, S. A.; White, N. E.; Liedahl, D. A.; Singh, K. P.

1997-05-01

We present simultaneous observations taken in Mar 1996 of the bright stellar coronal source Capella (HD 34029) with the ASCA and EUVE satellites. Previous EUVE observations of Fe emission lines (Fe VIII --- XXIV, excluding XVII) revealed a narrow emission measure feature at 6 x 10(6) K, which has proven to be remarkably stable over several years (flux from Fe XVIII and XIX has not varied by more than 30%), while lines formed at higher temperatures have shown intensity variations up to factors of 4. Furthermore, extremely high signal-to-noise spectra obtained by summing all EUVE measurements show that the Fe/H abundance ratio is consistent with solar photospheric. (See Dupree et al. 1993, ApJ, 418, L41; Brickhouse, Raymond, & Smith 1995, ApJSupp, 97, 551; Brickhouse 1996, IAU Coll. 152, Astrophysics in the Extreme Ultraviolet, Bowyer & Malina, eds (Kluwer), 141.) Meanwhile, the ASCA data of Capella have proven notoriously difficult to analyze. The performance verification (PV) phase data suggested a somewhat subsolar Fe abundance, but models were in poor agreement with the data (chi (2red) ~ 6). (See Drake 1996, Conf. on Cosmic Abundances, U. Maryland). Since the emission lines observed by EUVE are formed at the same emitting temperatures as the X-ray spectrum (Capella is ``soft'' such that very little flux is observed above 2 keV), the emission measure distribution derived from EUVE lines should provide a direct prediction of the X-ray spectrum, with only the relative abundances of species other than Fe as free parameters. Like the PV data, the new ASCA spectrum is not well fit by any of the standard models. Applying the constraints imposed by EUVE does not make a major improvement in the fit --- multi-thermal, variable abundance models such as Raymond-Smith and MEKAL do not provide any acceptable fit (chi (2red) > 5). We discuss our efforts to understand the X-ray spectrum, including studies of the uncertainties in the atomic data and of the underlying assumptions of the source models.

High brightness electrodeless Z-Pinch EUV source for mask inspection tools

NASA Astrophysics Data System (ADS)

Horne, Stephen F.; Partlow, Matthew J.; Gustafson, Deborah S.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2012-03-01

Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 1995. The source is currently being used for metrology, mask inspection, and resist development. Energetiq's higher brightness source has been selected as the source for pre-production actinic mask inspection tools. This improved source enables the mask inspection tool suppliers to build prototype tools with capabilities of defect detection and review down to 16nm design rules. In this presentation we will present new source technology being developed at Energetiq to address the critical source brightness issue. The new technology will be shown to be capable of delivering brightness levels sufficient to meet the HVM requirements of AIMS and ABI and potentially API tools. The basis of the source technology is to use the stable pinch of the electrodeless light source and have a brightness of up to 100W/mm(carat)2-sr. We will explain the source design concepts, discuss the expected performance and present the modeling results for the new design.

LPP-EUV light source for HVM lithography

NASA Astrophysics Data System (ADS)

Saito, T.; Ueno, Y.; Yabu, T.; Kurosawa, A.; Nagai, S.; Yanagida, T.; Hori, T.; Kawasuji, Y.; Abe, T.; Kodama, T.; Nakarai, H.; Yamazaki, T.; Mizoguchi, H.

2017-01-01

We have been developing a laser produced plasma extremely ultra violet (LPP-EUV) light source for a high volume manufacturing (HVM) semiconductor lithography. It has several unique technologies such as the high power short pulse carbon dioxide (CO2) laser, the short wavelength solid-state pre-pulse laser and the debris mitigation technology with the magnetic field. This paper presents the key technologies for a high power LPP-EUV light source. We also show the latest performance data which is 188W EUV power at intermediate focus (IF) point with 3.7% conversion efficiency (CE) at 100 kHz.

Core tungsten radiation diagnostic calibration by small shell pellet injection in the DIII-D tokamak

DOE PAGES

Hollmann, Eric M.; Commaux, Nicolas; Shiraki, Daisuke; ...

2017-10-04

Injection of small (OD = 0.8 mm) plastic pellets carrying embedded smaller (10 μg) tungsten grains is used to check calibrations of core tungsten line radiation diagnostics in support of the 2016 tungsten rings campaign in the DIII-D tokamak. The total (1 eV – 10 keV) and soft x-ray (1 keV – 10 keV) brightnesses we observed were found to be reasonably well (< factor 2) predicted using existing calibration factors and rate calculations. Individual core (EUV/SXR) tungsten line brightnesses appear to be somewhat less reliable (factor 2-4) for prediction of core tungsten concentration.

Core tungsten radiation diagnostic calibration by small shell pellet injection in the DIII-D tokamak

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hollmann, Eric M.; Commaux, Nicolas; Shiraki, Daisuke

Injection of small (OD = 0.8 mm) plastic pellets carrying embedded smaller (10 μg) tungsten grains is used to check calibrations of core tungsten line radiation diagnostics in support of the 2016 tungsten rings campaign in the DIII-D tokamak. The total (1 eV – 10 keV) and soft x-ray (1 keV – 10 keV) brightnesses we observed were found to be reasonably well (< factor 2) predicted using existing calibration factors and rate calculations. Individual core (EUV/SXR) tungsten line brightnesses appear to be somewhat less reliable (factor 2-4) for prediction of core tungsten concentration.

Extreme ultraviolet interferometry

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goldberg, Kenneth A.

EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical dimension and smaller. In order to achieve diffraction-limited performance, all-reflective multilayer-coated lithographic imaging systems operating near 13-nm wavelength and 0.1 NA have system wavefront tolerances of 0.27 nm, or 0.02 waves RMS. Owing to the highly-sensitive resonant reflective properties of multilayer mirrors and extraordinarily tight tolerances set forth for their fabrication, EUV optical systems require at-wavelength EUV interferometry for final alignment and qualification. This dissertation discusses the development and successful implementation of high-accuracy EUV interferometric techniques. Proof-of-principle experiments with a prototype EUV point-diffraction interferometer for themore » measurement of Fresnel zoneplate lenses first demonstrated sub-wavelength EUV interferometric capability. These experiments spurred the development of the superior phase-shifting point-diffraction interferometer (PS/PDI), which has been implemented for the testing of an all-reflective lithographic-quality EUV optical system. Both systems rely on pinhole diffraction to produce spherical reference wavefronts in a common-path geometry. Extensive experiments demonstrate EUV wavefront-measuring precision beyond 0.02 waves RMS. EUV imaging experiments provide verification of the high-accuracy of the point-diffraction principle, and demonstrate the utility of the measurements in successfully predicting imaging performance. Complementary to the experimental research, several areas of theoretical investigation related to the novel PS/PDI system are presented. First-principles electromagnetic field simulations of pinhole diffraction are conducted to ascertain the upper limits of measurement accuracy and to guide selection of the pinhole diameter. Investigations of the relative merits of different PS/PDI configurations accompany a general study of the most significant sources of systematic measurement errors. To overcome a variety of experimental difficulties, several new methods in interferogram analysis and phase-retrieval were developed: the Fourier-Transform Method of Phase-Shift Determination, which uses Fourier-domain analysis to improve the accuracy of phase-shifting interferometry; the Fourier-Transform Guided Unwrap Method, which was developed to overcome difficulties associated with a high density of mid-spatial-frequency blemishes and which uses a low-spatial-frequency approximation to the measured wavefront to guide the phase unwrapping in the presence of noise; and, finally, an expedient method of Gram-Schmidt orthogonalization which facilitates polynomial basis transformations in wave-front surface fitting procedures.« less

Low density of neutral hydrogen and helium in the local interstellar medium: Extreme Ultraviolet Explorer photometry of the Lyman continuum of the hot white dwarfs MCT 0501-2858, MCT 0455-2812, HZ 43, and GD 153

NASA Technical Reports Server (NTRS)

Vennes, Stephane; Dupuis, Jean; Bowyer, Stuart; Fontaine, Gilles; Wiercigroch, Alexandria; Jelinsky, Patrick; Wesemael, Francois; Malina, Roger

1994-01-01

The first comprehensive sky survey of the extreme ultraviolet (EUV) spectral range performed by the Extreme Ultraviolet Explorer (EUVE) has uncovered a handful of very bright sources at wavelengths longer than the He I 504 A photoionization edge. Among these objects are four white dwarfs with exceptionally low interstellar medium (ISM) column densities along the line of sight. Analysis of EUV photometry of the He-rich DO white dwarf MCT 0501-2858 and the H-rich DA white dwarf MCT 0455-2812 along one line of sight and of the DA white dwarfs HZ 43 and GD 153 near the north Galactic pole indicates that the overall minimum column density of the neutral material centered on the Sun is N(H I) = 0.5-1.0 x 10(exp 18)/sq cm. In the case of MCT 0501-2858, EUV photometric measurements provide a clear constraint to the effective temperature (60,000-70,000 K). Given these neutral hydrogen columns, the actual contribution to the density of neutral species from the immediate solar environment (the 'local fluff') would only cover a distance of approximately equals 2-3 pc (assuming an average density n(H I) = 0.1/cu cm) leaving these lines of sight almost entirely within the hot phase of the ISM. A preliminary examination of the complete EUVE long-wavelength survey indicates that these lines of sight are exceptional and set a minimum column density in the solar environment.

Fast and robust segmentation in the SDO-AIA era

NASA Astrophysics Data System (ADS)

Verbeeck, Cis; Delouille, Véronique; Mampaey, Benjamin; Hochedez, Jean-François; Boyes, David; Barra, Vincent

Solar images from the Atmospheric Imaging Assembly (AIA) aboard the Solar Dynamics Ob-servatory (SDO) will flood the solar physics community with a wealth of information on solar variability, of great importance both in solar physics and in view of Space Weather applica-tions. Obtaining this information, however, requires the ability to automatically process large amounts of data in an objective fashion. In previous work, we have proposed a multi-channel unsupervised spatially-constrained multi-channel fuzzy clustering algorithm (SPoCA) that automatically segments EUV solar images into Active Regions (AR), Coronal Holes (CH), and Quiet Sun (QS). This algorithm will run in near real time on AIA data as part of the SDO Feature Finding Project, a suite of software pipeline modules for automated feature recognition and analysis for the imagery from SDO. After having corrected for the limb brightening effect, SPoCA computes an optimal clustering with respect to the regions of interest using fuzzy logic on a quality criterion to manage the various noises present in the images and the imprecision in the definition of the above regions. Next, the algorithm applies a morphological opening operation, smoothing the cluster edges while preserving their general shape. The process is fast and automatic. A lower size limit is used to distinguish AR from Bright Points. As the algorithm segments the coronal images according to their brightness, it might happen that an AR is detected as several disjoint pieces, if the brightness in between is somewhat lower. Morphological dilation is employed to reconstruct the AR themselves from their constituent pieces. Combining SPoCA's detection of AR, CH, and QS on subsequent images allows automatic tracking and naming of any region of interest. In the SDO software pipeline, SPoCA will auto-matically populate the Heliophysics Events Knowledgebase(HEK) with Active Region events. Further, the algorithm has a huge potential for correct and automatic identification of AR, CH, and QS in any study that aims to address properties of those specific regions in the corona. SPoCA is now ready and waiting to tackle solar cycle 24 using SDO data. While we presently apply SPoCA to EUV data, the method is generic enough to allow the introduction of other channels or data, e.g., Differential Emission Measure (DEM) maps. Because of the unprecedented challenges brought up by the quantity of SDO data, European partners have gathered within an ISSI team on `Mining and Exploiting the NASA Solar Dynam-ics Observatory data in Europe' (a.k.a. Soldyneuro). Its aim is to provide automated feature recognition algorithms for scanning the SDO archive, as well as conducting scientific studies that combine different algorithm's outputs. Within the Soldyneuro project, we will use data from the EUV Variability Experiment (EVE) spectrometer in order to estimate the full Sun DEM. This DEM will next be used to estimate the total flux from AIA images so as to provide a validation for the calibration of AIA.

Spectroscopic study of a dark lane and a cool loop in a solar limb active region by Hinode/EIS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lee, Kyoung-Sun; Imada, S.; Moon, Y.-J.

2014-01-10

We investigated a cool loop and a dark lane over a limb active region on 2007 March 14 using the Hinode/EUV Imaging Spectrometer. The cool loop is clearly seen in the spectral lines formed at the transition region temperature. The dark lane is characterized by an elongated faint structure in the coronal spectral lines and is rooted on a bright point. We examined their electron densities, Doppler velocities, and nonthermal velocities as a function of distance from the limb. We derived electron densities using the density sensitive line pairs of Mg VII, Si X, Fe XII, Fe XIII, and Femore » XIV spectra. We also compared the observed density scale heights with the calculated scale heights from each peak formation temperatures of the spectral lines under the hydrostatic equilibrium. We noted that the observed density scale heights of the cool loop are consistent with the calculated heights, with the exception of one observed cooler temperature; we also found that the observed scale heights of the dark lane are much lower than their calculated scale heights. The nonthermal velocity in the cool loop slightly decreases along the loop, while nonthermal velocity in the dark lane sharply falls off with height. Such a decrease in the nonthermal velocity may be explained by wave damping near the solar surface or by turbulence due to magnetic reconnection near the bright point.« less

EUVE GO Survey: High Levels of User Satisfaction

NASA Astrophysics Data System (ADS)

Stroozas, B. A.

2000-12-01

This paper describes the results of a detailed customer survey of Guest Observers (GOs) for NASA's Extreme Ultraviolet Explorer (EUVE) astronomy satellite observatory. The purpose of the research survey was to (1) measure the levels of GO customer satisfaction with respect to EUVE observing services, and (2) compare the observing experiences of EUVE GOs with their experiences using other satellite observatories. This survey was conducted as a business research project -- part of the author's graduate work as an MBA candidate. A total sample of 38 respondents, from a working population of 101 "active" EUVE GOs, participated in this survey. The results, which provided a profile of the "typical" EUVE GO, showed in a statistically significant fashion that these GOs were more than satisfied with the available EUVE observing services. In fact, the sample GOs generally rated their EUVE observing experiences to be better than average as compared to their experiences as GOs on other missions. These relatively high satisfaction results are particularly pleasing to the EUVE Project which, given its significantly reduced staffing environment at U.C. Berkeley, has continued to do more with less. This paper outlines the overall survey process: the relevant background and previous research, the survey design and methodology, and the final results and their interpretation. The paper also points out some general limitations and weaknesses of the study, along with some recommended actions for the EUVE Project and for NASA in general. This work was funded by NASA/UCB Cooperative Agreement NCC5-138.

Compensation of flare-induced CD changes EUVL

DOEpatents

Bjorkholm, John E [Pleasanton, CA; Stearns, Daniel G [Los Altos, CA; Gullikson, Eric M [Oakland, CA; Tichenor, Daniel A [Castro Valley, CA; Hector, Scott D [Oakland, CA

2004-11-09

A method for compensating for flare-induced critical dimensions (CD) changes in photolithography. Changes in the flare level results in undesirable CD changes. The method when used in extreme ultraviolet (EUV) lithography essentially eliminates the unwanted CD changes. The method is based on the recognition that the intrinsic level of flare for an EUV camera (the flare level for an isolated sub-resolution opaque dot in a bright field mask) is essentially constant over the image field. The method involves calculating the flare and its variation over the area of a patterned mask that will be imaged and then using mask biasing to largely eliminate the CD variations that the flare and its variations would otherwise cause. This method would be difficult to apply to optical or DUV lithography since the intrinsic flare for those lithographies is not constant over the image field.

A volume-limited survey of High Galactic latitude planetary nebulae with the Extrme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Fruscione, Antonella; Drake, Jeremy J.; Mcdonald, Kelley; Malina, Roger F.

1995-01-01

We present the results of a complete survey, at extreme-ultraviolet (EUV) wavelengths (58-234 A), of the high Galactic latitude (absolute value of b greater than or = to 20 deg) planetary nebulae (PNs) with at least one determination of the distance within 1 kpc of the Sun. The sample comprises 27 objects observed during the Extreme Ultraviolet Explorer (EUVE) all-sky survey and represents the majority of PN likely to be accessible at EUV wavelengths. Six PNs (NGC 246, NGC 1360, K1-16, LoTr 5, NGC 4361, and NGC 3587) were detected in the shortest EUV band (58-174 A). A seventh PN (NGC 6853), not included in the sample, was also detected during the survey. The emission is consistent in all cases with that of a point source and therefore most probably originates from the PN central star. Accurate EUV count rates or upper limits in the two shorter EUVE bands (centered at approximately 100 and 200 A) are given for all the sources in the sample. NGC 4361 and NGC 3587 are reported here for the first time as sources of EUV radiation. As might be expected, attenuation by the interstellar medium dominates the PN distribution in the EUV sky.

Multi-thermal observations of flares and eruptions with the Atmospheric Imaging Assembly on the Solar Dynamics Observatory. (Invited)

NASA Astrophysics Data System (ADS)

Schrijver, C. J.; Aia Science Team

2010-12-01

The revolutionary advance in observational capabilities offered by SDO's AIA offers new views of solar flares and eruptions. The high cadence and spatial resolution, the full-Sun coverage, and the variety of thermal responses of the AIA channels from thousands to millions of degrees enable the study the source regions of solar explosions, as well as the responses of the solar corona from their immediate vicinity to regions over a solar radius away. These observations emphasize the importance of magnetic connectivity and topology, the frequent occurrence of fast wave-like perturbations, and the contrasts between impulsive compact X-ray-bright flares and long-duration EUV-bright phenomena.

Fibrillar Chromospheric Spicule-Like Counterparts to an EUV and Soft X-Ray Blowout Coronal Jet

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.; Harra, Louise K.; Moore, Ronald L.

2010-01-01

We observe an erupting jet feature in a solar polar coronal hole, using data from Hinode/SOT, EIS, and XRT, with supplemental data from STEREO/EUVI. From EUV and soft X-ray (SXR) images we identify the erupting feature as a blowout coronal jet: in SXRs it is a jet with bright base, and in EUV it appears as an eruption of relatively cool (approximately 50,000 K) material of horizontal size scale approximately 30" originating from the base of the SXR jet. In SOT Ca II H images the most pronounced analog is a pair of thin (approximately 1") ejections, at the locations of either of the two legs of the erupting EUV jet. These Ca II features eventually rise beyond 45", leaving the SOT field of view, and have an appearance similar to standard spicules except that they are much taller. They have velocities similar to that of "type II" spicules, approximately 100 kilometers per second, and they appear to have spicule-like substructures splitting off from them with horizontal velocity approximately 50 kilometers per second, similar to the velocities of splitting spicules measured by Sterling et al. (2010). Motions of splitting features and of other substructures suggest that the macroscopic EUV jet is spinning or unwinding as it is ejected. This and earlier work suggests that a sub-population of Ca II type II spicules are the Ca II manifestation of portions of larger-scale erupting magnetic jets. A different sub-population of type II spicules could be blowout jets occurring on a much smaller horizontal size scale than the event we observe here.

The quiescent and flaring EUV spectrum of Algol and its relationship to other active coronae. EUV spectroscopy of bright hyades coronae: 71 Tauri and Theta 1 Tauri

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1994-01-01

This program involves analysis and interpretation of EUVE spectrometer observations of the active stars Algol (beta Per) and 71 Tauri. The EUVE satellite spectrometers observed the prototype eclipsing binary Algol over nearly 1.5 orbital periods. Effective exposure times were 100 ksec and 89 ksec in the short wave (70-180 A) and medium wave (140-370 A) channels. High temperature (up to 20 MK) Fe XVI-XXIV emission lines are clearly detected in the overall spectrum. In addition, a quiescent continuum is present which increases towards shorter wavelengths. Using synthesized spectra of optically thin line and continuum emission folded through the instrumental response, we have examined constraints on the (Fe/H) coronal abundance in Algol. We find that the coronal Fe is underabundant by factors that approximately equal 2-4 relative to solar photospheric values, unless an unreasonably large quantity of coronal plasma at T greater than 30 MK is present in the quiescent spectrum. The latter possibility is, however, inconsistent with available X-ray data. Lightcurves of the high temperature EUV lines compared to line emission at He II 304 A show considerable differences, with much deeper minima present in the He II line during both primary and secondary eclipses. Toward the end of the observation a moderate flare lasting approximately 6 hours was detected in the high temperature Fe emission lines. The 71 Tau observation, for about the same exposure time, revealed only a handful of weak emission lines; however, the strongest lines were also those of Fe XXIII/XX, suggesting a hot coronal plasma. No obvious flaring or other variation was present in the 71 Tau Deep Survey lightcurve.

Comparison of Helioseismic Far-Side Active Region Detections with STEREO Far-Side EUV Observations of Solar Activity

NASA Astrophysics Data System (ADS)

Liewer, P. C.; Qiu, J.; Lindsey, C.

2017-10-01

Seismic maps of the Sun's far hemisphere, computed from Doppler data from the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory (SDO) are now being used routinely to detect strong magnetic regions on the far side of the Sun (http://jsoc.stanford.edu/data/farside/). To test the reliability of this technique, the helioseismically inferred active region detections are compared with far-side observations of solar activity from the Solar TErrestrial RElations Observatory (STEREO), using brightness in extreme-ultraviolet light (EUV) as a proxy for magnetic fields. Two approaches are used to analyze nine months of STEREO and HMI data. In the first approach, we determine whether new large east-limb active regions are detected seismically on the far side before they appear Earth side and study how the detectability of these regions relates to their EUV intensity. We find that while there is a range of EUV intensities for which far-side regions may or may not be detected seismically, there appears to be an intensity level above which they are almost always detected and an intensity level below which they are never detected. In the second approach, we analyze concurrent extreme-ultraviolet and helioseismic far-side observations. We find that 100% (22) of the far-side seismic regions correspond to an extreme-ultraviolet plage; 95% of these either became a NOAA-designated magnetic region when reaching the east limb or were one before crossing to the far side. A low but significant correlation is found between the seismic signature strength and the EUV intensity of a far-side region.

Interferometric at-wavelength flare characterization of EUV optical systems

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2001-01-01

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.

MAGNETIC TOPOLOGY OF BUBBLES IN QUIESCENT PROMINENCES

DOE Office of Scientific and Technical Information (OSTI.GOV)

Dudik, J.; Aulanier, G.; Schmieder, B.

We study a polar-crown prominence with a bubble and its plume observed in several coronal filters by the SDO/AIA and in H{alpha} by the MSDP spectrograph in Bialkow (Poland) to address the following questions: what is the brightness of prominence bubbles in EUV with respect to the corona outside of the prominence and the prominence coronal cavity? What is the geometry and topology of the magnetic field in the bubble? What is the nature of the vertical threads seen within prominences? We find that the brightness of the bubble and plume is lower than the brightness of the corona outsidemore » of the prominence, and is similar to that of the coronal cavity. We constructed linear force-free models of prominences with bubbles, where the flux rope is perturbed by inclusion of parasitic bipoles. The arcade field lines of the bipole create the bubble, which is thus devoid of magnetic dips. Shearing the bipole or adding a second one can lead to cusp-shaped prominences with bubbles similar to the observed ones. The bubbles have complex magnetic topology, with a pair of coronal magnetic null points linked by a separator outlining the boundary between the bubble and the prominence body. We conjecture that plume formation involves magnetic reconnection at the separator. Depending on the viewing angle, the prominence can appear either anvil-shaped with predominantly horizontal structures, or cusp-shaped with predominantly vertical structuring. The latter is an artifact of the alignment of magnetic dips with respect to the prominence axis and the line of sight.« less

The Multi-Spectral Solar Telescope Array (MSSTA)

NASA Technical Reports Server (NTRS)

Walker, A. B. C., Jr.; Barbee, Troy W., Jr.; Hoover, Richard B.

1997-01-01

In 1987, our consortium pioneered the application of normal incidence multilayer X-ray optics to solar physics by obtaining the first high resolution narrow band, "thermally differentiated" images of the corona', using the emissions of the Fe IX/Fe X complex at ((lambda)lambda) approx. 171 A to 175 A, and He II Lyman (beta) at 256 A. Subsequently, we developed a rocket borne solar observatory, the Multi Spectral Solar Telescope Array (MSSTA) that pioneered multi-thermal imaging of the solar atmosphere, using high resolution narrow band X-ray, EUV and FUV optical systems. Analysis of MSSTA observations has resulted in four significant insights into the structure of the solar atmosphere: (1) the diameter of coronal loops is essentially constant along their length; (2) models of the thermal and density structure of polar plumes based on MSSTA observations have been shown to be consistent with the thesis that they are the source of high speed solar wind streams; (3) the magnetic structure of the footpoints of polar plumes is monopolar, and their thermal structure is consistent with the thesis that the chromosphere at their footpoints is heated by conduction from above; (4) coronal bright points are small loops, typically 3,500 - 20,000 km long (5 sec - 30 sec); their footpoints are located at the poles of bipolar magnetic structures that are are distinguished from other network elements by having a brighter Lyman a signature. Loop models derived for 26 bright points are consistent with the thesis that the chromosphere at their footpoints is heated by conduction from the corona.

MHD Modelling of Coronal Loops: Injection of High-Speed Chromospheric Flows

NASA Technical Reports Server (NTRS)

Petralia, A.; Reale, F.; Orlando, S.; Klimchuk, J. A.

2014-01-01

Context. Observations reveal a correspondence between chromospheric type II spicules and bright upward-moving fronts in the corona observed in the extreme-ultraviolet (EUV) band. However, theoretical considerations suggest that these flows are probably not the main source of heating in coronal magnetic loops. Aims. We investigate the propagation of high-speed chromospheric flows into coronal magnetic flux tubes and the possible production of emission in the EUV band. Methods. We simulated the propagation of a dense 104 K chromospheric jet upward along a coronal loop by means of a 2D cylindrical MHD model that includes gravity, radiative losses, thermal conduction, and magnetic induction. The jet propagates in a complete atmosphere including the chromosphere and a tenuous cool (approximately 0.8 MK) corona, linked through a steep transition region. In our reference model, the jet initial speed is 70 km per second, its initial density is 10(exp 11) per cubic centimeter, and the ambient uniform magnetic field is 10 G. We also explored other values of jet speed and density in 1D and different magnetic field values in 2D, as well as the jet propagation in a hotter (approximately 1.5 MK) background loop. Results. While the initial speed of the jet does not allow it to reach the loop apex, a hot shock-front develops ahead of it and travels to the other extreme of the loop. The shock front compresses the coronal plasma and heats it to about 10(exp 6) K. As a result, a bright moving front becomes visible in the 171 Angstrom channel of the SDO/AIA mission. This result generally applies to all the other explored cases, except for the propagation in the hotter loop. Conclusions. For a cool, low-density initial coronal loop, the post-shock plasma ahead of upward chromospheric flows might explain at least part of the observed correspondence between type II spicules and EUV emission excess.

EUV spectroscopy of high-redshift x-ray objects

NASA Astrophysics Data System (ADS)

Kowalski, M. P.; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.; Barstow, M. A.

2010-07-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGN for example, will be redshifted into the EUV waveband. Consequently, a wealth of critical spectral diagnostics, provided by, for example, the Fe L-shell complex and the O VII/VIII lines, will be lost to future planned X-ray missions (e.g., IXO, Gen-X) if operated at traditional X-ray energies. This opens up a critical gap in performance located at short EUV wavelengths, where critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nanolaminate replication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs. We conclude with a discussion of a breakthrough technology, nanolaminate replication, which enables such instruments.

Compact and Light-Weight Solar Spaceflight Instrument Designs Utilizing Newly Developed Miniature Free-Standing Zone Plates: EUV Radiometer and Limb-Scanning Monochromator

NASA Astrophysics Data System (ADS)

Seely, J. F.; McMullin, D. R.; Bremer, J.; Chang, C.; Sakdinawat, A.; Jones, A. R.; Vest, R.

2014-12-01

Two solar instrument designs are presented that utilize newly developed miniature free-standing zone plates having interconnected Au opaque bars and no support membrane resulting in excellent long-term stability in space. Both instruments are based on a zone plate having 4 mm outer diameter and 1 to 2 degree field of view. The zone plate collects EUV radiation and focuses a narrow bandpass through a pinhole aperture and onto a silicon photodiode detector. As a miniature radiometer, EUV irradiance is accurately determined from the zone plate efficiency and the photodiode responsivity that are calibrated at the NIST SURF synchrotron facility. The EUV radiometer is pointed to the Sun and measures the absolute solar EUV irradiance in high time cadence suitable for solar physics and space weather applications. As a limb-scanning instrument in low earth orbit, a miniature zone-plate monochromator measures the extinction of solar EUV radiation by scattering through the upper atmosphere which is a measure of the variability of the ionosphere. Both instruments are compact and light-weight and are attractive for CubeSats and other missions where resources are extremely limited.

Development of a 1m-normal-incidence-EUV-Telescope

NASA Technical Reports Server (NTRS)

Grewing, M.; Kraemer, G.; Schulz-Luepertz, E.; Wulf-Mathies, C.; Bowyer, S.; Jacobsen, P.; Jelinsky, P.; Kimble, R.

1982-01-01

A brief description is given of the 1m-EUV-Telescope and its focal plane instrumentation, namely an EUV spectrometer and six EUV/FUV photometers. The telescope is scheduled for launch on an Aries rocket on June 17, 1982. The principal goals are the white dwarf HZ43 and a photometric scan across the sky in an area of the sky where 21 cm line observations reveal a steep density gradient. The optical bench of the telescope is a cylinder made of a graphite epoxy compound. Despite its low specific weight, the bench shows an excellent mechanical performance, with an elasticity modulus of approximately 70,000 N/cu mm. It is pointed out that by carefully combining layers with different winding angles of the carbon fiber, the thermal expansion along the cylinder axis is almost negligible, even under severe thermal loads

Coronal energy distribution and X-ray activity in the small scale magnetic field of the quiet sun

NASA Technical Reports Server (NTRS)

Habbal, S. R.

1992-01-01

The energy distribution in the small-scale magnetic field that pervades the solar surface, and its relationship to X-ray/coronal activity are discussed. The observed emission from the small scale structures, at temperatures characteristic of the chromosphere, transition region and corona, emanates from the boundaries of supergranular cells, within coronal bright points. This emission is characterized by a strong temporal and spatial variability with no definite pattern. The analysis of simultaneous, multiwavelength EUV observations shows that the spatial density of the enhanced as well as variable emission from the small scale structures exhibits a pronounced temperature dependence with significant maxima at 100,000 and 1,000,000 K. Within the limits of the spatial (1-5 arcsec) and temporal (1-5 min) resolution of data available at present, the observed variability in the small scale structure cannot account for the coroal heating of the quiet sun. The characteristics of their emission are more likely to be an indicator of the coronal heating mechanisms.

EUV Spectroscopy of High-redshift X-ray Objects

NASA Astrophysics Data System (ADS)

Kowalski, Michael Paul; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.

2010-03-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGNs for example, will have their maxima redshifted into the EUV waveband ( 90-912 Å/0.1-0.01 keV). Consequently, a wealth of spectral diagnostics, provided by, for example, the Fe L-shell complex ( 60-6 Å/0.2-2.0 keV) and the O VII/VIII lines ( 20 Å/0.5 keV), will be lost to X-ray instruments operating at traditional ( 0.5-10 keV) and higher X-ray energies. There are precedents in other wavebands. For example, HST evolutionary studies will become largely the province of JWST. Despite the successes of EUVE, the ROSAT WFC, and the Chandra LETG, the EUV continues to be unappreciated and under-utilized, partly because of a preconception that absorption by neutral galactic Hydrogen in the ISM prevents any useful extragalactic measurements at all EUV wavelengths and, until recently, by a lack of a suitable enabling technology. Thus, if future planned X-ray missions (e.g., IXO, Gen-X) are optimized again for traditional X-ray energies, their performance (effective area, resolving power) will be cut off at ultrasoft X-ray energies or at best be radically reduced in the EUV. This opens up a critical gap in performance located right at short EUV wavelengths, where the critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nano-laminate fabrication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs.

Solar Coronal Structure Study

NASA Technical Reports Server (NTRS)

Nitta, Nariaki; Bruner, Marilyn E.; Saba, Julia; Strong, Keith; Harvey, Karen

2000-01-01

The subject of this investigation is to study the physics of the solar corona through the analysis of the EUV and UV data produced by two flights (12 May 1992 and 25 April 1994) of the Lockheed Solar Plasma Diagnostics Experiment (SPDE) sounding rocket payload, in combination with Yohkoh and ground-based data. Each rocket flight produced both spectral and imaging data. These joint datasets are useful for understanding the physical state of various features in the solar atmosphere at different heights ranging from the photosphere to the corona at the time of the, rocket flights, which took place during the declining phase of a solar cycle, 2-4 years before the minimum. The investigation is narrowly focused on comparing the physics of small- and medium-scale strong-field structures with that of large-scale, weak fields. As we close th is investigation, we have to recall that our present position in the understanding of basic solar physics problems (such as coronal heating) is much different from that in 1995 (when we proposed this investigation), due largely to the great success of SOHO and TRACE. In other words, several topics and techniques we proposed can now be better realized with data from these missions. For this reason, at some point of our work, we started concentrating on the 1992 data, which are more unique and have more supporting data. As a result, we discontinued the investigation on small-scale structures, i.e., bright points, since high-resolution TRACE images have addressed more important physics than SPDE EUV images could do. In the final year, we still spent long time calibrating the 1992 data. The work was complicated because of the old-fashioned film, which had problems not encountered with more modern CCD detectors. After our considerable effort on calibration, we were able to focus on several scientific topics, relying heavily on the SPDE UV images. They include the relation between filaments and filament channels, the identification of hot loops, and the physical conditions of such loops especially at their foot-points. A total of four papers were completed from this contract which are listed in the last section.

Improvements in resist performance towards EUV HVM

NASA Astrophysics Data System (ADS)

Yildirim, Oktay; Buitrago, Elizabeth; Hoefnagels, Rik; Meeuwissen, Marieke; Wuister, Sander; Rispens, Gijsbert; van Oosten, Anton; Derks, Paul; Finders, Jo; Vockenhuber, Michaela; Ekinci, Yasin

2017-03-01

Extreme ultraviolet (EUV) lithography with 13.5 nm wavelength is the main option for sub-10nm patterning in the semiconductor industry. We report improvements in resist performance towards EUV high volume manufacturing. A local CD uniformity (LCDU) model is introduced and validated with experimental contact hole (CH) data. Resist performance is analyzed in terms of ultimate printing resolution (R), line width roughness (LWR), sensitivity (S), exposure latitude (EL) and depth of focus (DOF). Resist performance of dense lines at 13 nm half-pitch and beyond is shown by chemical amplified resist (CAR) and non-CAR (Inpria YA Series) on NXE scanner. Resolution down to 10nm half pitch (hp) is shown by Inpria YA Series resist exposed on interference lithography at the Paul Sherrer Institute. Contact holes contrast and consequent LCDU improvement is achieved on a NXE:3400 scanner by decreasing the pupil fill ratio. State-of-the-art imaging meets 5nm node requirements for CHs. A dynamic gas lock (DGL) membrane is introduced between projection optics box (POB) and wafer stage. The DGL membrane will suppress the negative impact of resist outgassing on the projection optics by 100%, enabling a wider range of resist materials to be used. The validated LCDU model indicates that the imaging requirements of the 3nm node can be met with single exposure using a high-NA EUV scanner. The current status, trends, and potential roadblocks for EUV resists are discussed. Our results mark the progress and the improvement points in EUV resist materials to support EUV ecosystem.

Non-Potential Magnetic Fields and Magnetic Reconnection In Low Collisional Plasmas-Discovery of Solar EUV Mini-Sigmoids and Development of Novel In-Space Propulsion Systems

NASA Astrophysics Data System (ADS)

Chesny, David

Magnetic reconnection is the source of many of the most powerful explosions of astrophysical plasmas in the universe. Blazars, magnetars, stellar atmospheres, and planetary magnetic fields have all been shown to be primary sites of strong reconnection events. For studying the fundamental physics behind this process, the solar atmosphere is our most accessible laboratory setting. Magnetic reconnection resulting from non-potential fields leads to plasma heating and particle acceleration, often in the form of explosive activity, contributing to coronal heating and the solar wind. Large-scale non-potential (sigmoid) fields in the solar atmosphere are poorly understood due to their crowded neighborhoods. For the first time, small-scale, non-potential loop structures have been observed in quiet Sun EUV observations. Fourteen unique mini-sigmoid events and three diffuse non-potential loops have been discovered, suggesting a multi-scaled self-similarity in the sigmoid formation process. These events are on the order of 10 arcseconds in length and do not appear in X-ray emissions, where large-scale sigmoids are well documented. We have discovered the first evidence of sigmoidal structuring in EUV bright point phenomena, which are prolific events in the solar atmosphere. Observations of these mini-sigmoids suggest that they are being formed via tether-cutting reconnection, a process observed to occur at active region scales. Thus, tether-cutting is suggested to be ubiquitous throughout the solar atmosphere. These dynamics are shown to be a function of the free magnetic energy in the quiet Sun network. Recently, the reconnection process has been reproduced in Earth-based laboratory tokamaks. Easily achievable magnetic field configurations can induce reconnection and result in ion acceleration. Here, magnetic reconnection is utilized as the plasma acceleration mechanism for a theoretical propulsion system. The theory of torsional spine reconnection is shown to result in ion velocities of > 3000 km s-1 and thrusts on the order of 3-15 N. As current in-use ion propulsion technology can only achieve ˜ 30 km s-1, the proposed design can substantially increase thrust on a spacecraft and provide for fast manned interplanetary travel.

Investigation of the solar UV/EUV heating effect on the Jovian radiation belt by GMRT-IRTF observation

NASA Astrophysics Data System (ADS)

Kita, H.; Misawa, H.; Bhardwaj, A.; Tsuchiya, F.; Tao, C.; Uno, T.; Kondo, T.; Morioka, A.

2012-12-01

Jupiter's synchrotron radiation (JSR) is the emission from relativistic electrons, and it is the most effective probe for remote sensing of Jupiter's radiation belt from the Earth. Recent intensive observations of JSR revealed short term variations of JSR with the time scale of days to weeks. Brice and McDonough (1973) proposed a scenario for the short term variations; i.e, the solar UV/EUV heating for Jupiter's upper atmosphere causes enhancement of total flux density. The purpose of this study is to investigate whether sufficient solar UV/EUV heating in Jupiter's upper atmosphere can actually causes variation in the JSR total flux and brightness distribution. Previous JSR observations using the Giant Metrewave Radio Telescope (GMRT) suggested important characteristics of short term variations; relatively low energy particles are accelerated by some acceleration processes which might be driven by solar UV/EUV heating and/or Jupiter's own magnetic activities. In order to evaluate the effect of solar UV/EUV heating on JSR variations, we made coordinated observations using the GMRT and NASA Infra-Red Telescope Facility (IRTF). By using IRTF, we can estimate the temperature of Jupiter's upper atmosphere from spectroscopic observation of H_3^+ infrared emission. Hence, we can evaluate the relationship between variations in Jupiter's upper atmosphere initiated by the solar UV/EUV heating and its linkage with the JSR. The GMRT observations were made during Nov. 6-17, 2011 at the frequency of 235/610MHz. The H_3^+ 3.953 micron line was observed using the IRTF during Nov. 7-12, 2011. During the observation period, the solar UV/EUV flux variations expected on Jupiter showed monotonic increase. A preliminary analysis of GMRT 610MHz band showed a radio flux variation similar to that in the solar UV/EUV. Radio images showed that the emission intensity increased at the outer region and the position of equatorial peak emission moved in the outward direction. If radial diffusion increases globally by the solar UV/EUV heating, it is expected that the peak intensity would increase and the peak position move inwards. However, our results are not consistent with the global enhancement of radial diffusion. In addition to that, the equatorial H_3^+ emission indicated that emission intensity decreased from the first day of observation to the last day. It is expected that equatorial temperature of Jupiter's atmosphere decreases during this observation period. Therefore, we propose that radial diffusion increased not globally but only at the outer region around L=2-3 during this period. From this hypothesis, it is expected that enhancement of radial diffusion at the outer region is caused by high latitude temperature enhancement. We discuss possible causes of the short term variations of JSR from the IRTF observation results at high latitude.

Short term variations in Jupiter's synchrotron radiation derived from VLA data analysis

NASA Astrophysics Data System (ADS)

Kita, H.; Misawa, H.; Tsuchiya, F.; Morioka, A.

2011-12-01

Jupiter's synchrotron radiation (JSR) is the emission from relativistic electrons in the strong magnetic field of the inner magnetosphere, and it is the most effective prove for remote sensing of Jupiter's radiation belt from the Earth. Although JSR has been thought to be stable for a long time, intensive observations for JSR have made after the collisions of comet P/SL9 to Jupiter in 1994, and these observations revealed short term variations of JSR on time scale of days to weeks. However, the mechanisms which cause the short term variations of total flux density and brightness distribution have not been revealed well. In order to reveal the mechanism of short term variations of JSR more precisely, we have made radio image analysis using the NRAO (National Radio Astronomy Observatory) archived data of the VLA [*]. Brice and McDonough [1973, Icarus] proposed a scenario for the short term variations: i.e, the solar UV/EUV heating for Jupiter's upper atmosphere drives neutral wind perturbations and then the induced dynamo electric field leads to enhancement of radial diffusion. It is also suggested that induced dynamo electric field produce dawn-dusk electric potential difference, which cause dawn-dusk asymmetry in electron spatial distribution and emission distribution. So far the following results have been indicated for the short term variations. Miyoshi et al. [1999, GRL] showed that a short term variation event at 2.3GHz is well correlate to solar UV/EUV flux variations. Tsuchiya et al. [2010, Adv. Geosci.] showed that JSR at 325MHz and 785MHz have short term variations. These JSR observations confirmed the existence of the short term variation which is caused by solar UV/EUV. However, the effect of solar UV/EUV heating on the spatial distribution of JSR has never been confirmed, so this study is the first attempt to confirm the solar UV/EUV effect on spatial distribution of JSR. We have selected the data observed from 28th Jan. to 5th Feb. 2000 at 327MHz. During the period, solar UV/EUV flux expected on Jupiter showed almost monotonic increase. It is expected from the analysis for the period that the enhancement of radial diffusion caused by solar UV/EUV heating produces total flux enhancement and dawn-dusk asymmetry of the emission distribution of the JSR. We can therefore examine the scenario by measuring total flux density and dawn-dusk peak emission ratio of JSR, and their relationships to the variation of solar UV/EUV activity. A preliminary result shows that total flux density variations occurred corresponding to the solar UV/EUV variations, but we couldn't find variations in the dawn-dusk asymmetry above the one rms level calculated from the background image. *The National Radio Astronomy Observatory is a facility of the National Science Foundation operated under cooperative agreement by Associated Universities, Inc.

UNDERCOVER EUV SOLAR JETS OBSERVED BY THE INTERFACE REGION IMAGING SPECTROGRAPH

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, N.-H.; Innes, D. E.

It is well-known that extreme ultraviolet (EUV) emission emitted at the solar surface is absorbed by overlying cool plasma. Especially in active regions, dark lanes in EUV images suggest that much of the surface activity is obscured. Simultaneous observations from the Interface Region Imaging Spectrograph, consisting of UV spectra and slit-jaw images (SJI), give vital information with sub-arcsecond spatial resolution on the dynamics of jets not seen in EUV images. We studied a series of small jets from recently formed bipole pairs beside the trailing spot of active region 11991, which occurred on 2014 March 5 from 15:02:21 UT tomore » 17:04:07 UT. Collimated outflows with bright roots were present in SJI 1400 Å (transition region) and 2796 Å (upper chromosphere) that were mostly not seen in Atmospheric Imaging Assembly (AIA) 304 Å (transition region) and AIA 171 Å (lower corona) images. The Si iv spectra show a strong blue wing enhancement, but no red wing, in the line profiles of the ejecta for all recurrent jets, indicating outward flows without twists. We see two types of Mg ii line profiles produced by the jets spires: reversed and non-reversed. Mg ii lines remain optically thick, but turn optically thin in the highly Doppler shifted wings. The energy flux contained in each recurrent jet is estimated using a velocity differential emission measure technique that measures the emitting power of the plasma as a function of the line-of-sight velocity. We found that all the recurrent jets release similar energy (10{sup 8} erg cm{sup −2} s{sup −1}) toward the corona and the downward component is less than 3%.« less

Undercover EUV Solar Jets Observed by the Interface Region Imaging Spectrograph

NASA Astrophysics Data System (ADS)

Chen, N.-H.; Innes, D. E.

2016-12-01

It is well-known that extreme ultraviolet (EUV) emission emitted at the solar surface is absorbed by overlying cool plasma. Especially in active regions, dark lanes in EUV images suggest that much of the surface activity is obscured. Simultaneous observations from the Interface Region Imaging Spectrograph, consisting of UV spectra and slit-jaw images (SJI), give vital information with sub-arcsecond spatial resolution on the dynamics of jets not seen in EUV images. We studied a series of small jets from recently formed bipole pairs beside the trailing spot of active region 11991, which occurred on 2014 March 5 from 15:02:21 UT to 17:04:07 UT. Collimated outflows with bright roots were present in SJI 1400 Å (transition region) and 2796 Å (upper chromosphere) that were mostly not seen in Atmospheric Imaging Assembly (AIA) 304 Å (transition region) and AIA 171 Å (lower corona) images. The Si IV spectra show a strong blue wing enhancement, but no red wing, in the line profiles of the ejecta for all recurrent jets, indicating outward flows without twists. We see two types of Mg II line profiles produced by the jets spires: reversed and non-reversed. Mg II lines remain optically thick, but turn optically thin in the highly Doppler shifted wings. The energy flux contained in each recurrent jet is estimated using a velocity differential emission measure technique that measures the emitting power of the plasma as a function of the line-of-sight velocity. We found that all the recurrent jets release similar energy (108 erg cm-2 s-1) toward the corona and the downward component is less than 3%.

Evaluation of the Minifilament-Eruption Scenario for Solar Coronal Jets in Polar Coronal Holes

NASA Technical Reports Server (NTRS)

Baikie, Tomi K.; Sterling, Alphonse C.; Falconer, David; Moore, Ronald L.; Savage, Sabrina L.

2016-01-01

Solar coronal jets are suspected to result from magnetic reconnection low in the Sun's atmosphere. Sterling et al. (2015) looked as 20 jets in polar coronal holes, using X-ray images from the Hinode/X-Ray Telescope (XRT) and EUV images from the Solar Dynamics Observatory (SDO) Atmospheric Imaging Assembly (AIA). They suggested that each jet was driven by the eruption of twisted closed magnetic field carrying a small-scale filament, which they call a 'minifilament', and that the jet was produced by reconnection of the erupting field with surrounding open field. In this study, we carry out a more extensive examination of polar coronal jets. From 180 hours of XRT polar coronal hole observations spread over two years (2014-2016), we identified 130 clearly-identifiable X-ray jet events and thus determined an event rate of over 17 jets per day per in the Hinode/XRT field of view. From the broader set, we selected 25 of the largest and brightest events for further study in AIA 171, 193, 211, and 304 Angstrom images. We find that at least the majority of the jets follow the minifilament-eruption scenario, although for some cases the evolution of the minifilament in the onset of its eruption is more complex than presented in the simplified schematic of Sterling et al. (2015). For all cases in which we could make a clear determination, the spire of the X-ray jet drifted laterally away from the jet-base-edge bright point; this spire drift away from the bright point is consistent with expectations of the minifilament-eruption scenario for coronal-jet production. This work was supported with funding from the NASA/MSFC Hinode Project Office, and from the NASA HGI program.

Height Dependence of Plasma Properties of a Dark Lane and a Cool Loop in a Solar Limb Active Region Observed by Hinode/EIS

NASA Astrophysics Data System (ADS)

Lee, K.; Imada, S.; Moon, Y.; Lee, J.

2013-12-01

We investigate spectral properties of a cool loop and a dark lane over a limb active region on 2007 March 14 by the Hinode/EUV Imaging Spectrometer. The cool loop is clearly seen in the spectral lines formed at the transition region temperature. The dark lane is characterized by an elongated faint structure in coronal spectral lines and rooted on a bright point. We determine their electron densities, Doppler velocities, and non-thermal velocities with height over the limb. We derived electron densities using the density sensitive line pairs of Mg VII, Si X, Fe XII, Fe XIII and Fe XIV spectra. Under the hydrostatic equilibrium and isothermal assumption, we determine their temperatures from the density scale height. Comparing the scale height temperatures to the peak formation temperatures of the spectral lines, we note that the scale height temperature of the cool loop is consistent with a peak formation temperature of the Fe XII and the scale height temperatures of the dark lane from each spectral lines are much lower than their peak formation temperatures. The non-thermal velocity in the cool loop slightly decreases along the loop while that in the dark lane sharply falls off with height. The variation of non-thermal velocity with height in the cool loop and the dark lane is contrast to that in off-limb polar coronal holes which are considered as source of the solar wind. Such a decrease in the non-thermal velocity may be explained by wave damping near the solar surface or turbulence due to magnetic reconnection near the bright point.

Extreme ultraviolet spectral irradiance measurements since 1946

NASA Astrophysics Data System (ADS)

Schmidtke, G.

2015-03-01

In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial irradiance camera (STI-Cam) and also be used investigating real-time space weather effects and deriving more detailed correction procedures for the evaluation of Global Navigation Satellite System (GNSS) signals. Progress in physics goes with achieving higher accuracy in measurements. This review historically guides the reader on the ways of exploring the impact of the variable solar radiation in the extreme ultraviolet spectral region on our upper atmosphere in the altitude regime from 80 to 1000 km.

Spherical EUV and Plasma Spectrometer (seps) -a Monitor to Measure the Plasma and EUV Environment in Space

NASA Astrophysics Data System (ADS)

Brunner, Raimund; Schmidtke, Gerhard; Konz, Werner; Pfeffer, Wilfried

A low-cost monitor to measure the EUV and plasma environment in space is presented. The device consists of three (or more) isolated spheres, a metallic sphere, one or more highly trans-parent Inner Grids and Outer Grids. Each one is being connected to a sensitive floating elec-trometer. By setting different potentials to the grids as well as to the sphere and varying one or more of their voltages, measurements of spectral solar EUV irradiance (15-200 nm), of local plasma parameters such as electron and ion densities, electron energies and temperatures as well as ion compositions and debris events can be derived from the current recordings. This detector does not require any (solar) pointing device. The primary goal is to study the impact of solar activity events (e.g. CMEs) as well as subsequent reactions of the ionospheric/thermospheric systems (including space weather occurences). The capability of SEPS for measuring EUV pho-ton fluxes as well as plasma parameters in the energy range from 0 to +/-70 eV is demonstrated by laboratory measurements as performed in the IPM laboratory, at BESSY-PTB electron syn-chrotron in Berlin and at ESA/ESTEC plasma chamber. Based on the laboratory recording of plasma recombination EUV emission the sensor is suitable to detect also auroral and airglow radiations. -The state of the art in the development of this device is reported.

Soft x-ray properties of the binary millisecond pulsar J0437-4715

NASA Technical Reports Server (NTRS)

Halpern, Jules P.; Martin, Christopher; Marshall, Herman L.

1995-01-01

We obtained a light curve for the 5.75 ms pulsar J0437-4715 in the 65-120 A range with 0.5 ms time resolution using the Deep Survey instrument on the EUVE satellite. The single-peaked profile has a pulsed fraction of 0. 27 +/- 0.05, similar to the ROSAT data in the overlapping energy band. A combined analysis of the EUVE and ROSAT data is consistent with a power-law spectrum of energy index alpha = 1.2-1.5, intervening column density NH = (5-8) x 10(exp 19)/sq cm, and luminosity 5.0 x 10(exp 30) ergs/s in the 0.1-2. 4 keV band. We also use a bright EUVE/ROSAT source only 4.3 deg from the pulsar, the Seyfert galaxy RX J0437.4-4711 (= EUVE J0437-471 = lES 0435-472), to obtain an independent upper limit on the intervening absorption to the pulsar, NH less than 1.2 x 10(exp 20)/sq cm. Although a blackbody spectrum fails to fit the ROSAT data, two-component spectral fits to the combined EUVE/ROSAT data are used to limit the temperatures and surface areas of thermal emission that might make partial contributions to the flux. A hot polar cap of radius 50-600 m and temperature (1.0-3.3) x 10(exp 6) K could be present. Alternatively, a larger region with T = (4-12) x 10(exp 5) K and area less than 200 sq km, might contribute most of the EUVE and soft X-ray flux, but only if a hotter component were present as well. Any of these temperatures would require some mechanism(s) of surface reheating to be operating in this old pulsar, the most plausible being the impact of accelerated electrons and positrons onto the polar caps. The kinematically corrected spin-down power of PSR J0437-4715 is only 4 x 10(exp 33) ergs/s, which is an order of magnitude less than that of the lowest-luminosity gamma-ray pulsars Geminga and PSR B1055-52. The absence of high-energy gamma-rays from PSR J0437-4715 might signify an inefficient or dead outer gap accelerator, which in turn accounts for the lack of a more luminous reheated surface such as those intermediate-age gamma-ray pulsars may have.

Soft X-Ray Properties of the Binary Millisecond Pulsar J0437-4715

NASA Technical Reports Server (NTRS)

Halpern, Jules P.; Martin, Christopher; Marshall, Herman, L.; Oliversen, Ronald (Technical Monitor)

2001-01-01

We obtained a light curve for the 5.75 ms pulsar J0437-4715 in the 65-120 A range with 0.5 ms time resolution using the Deep Survey instrument on the EUVE satellite. The single-peaked profile has a pulsed fraction of 0.27 +/- 0.05, similar to the ROSAT data in the overlapping energy band. A combined analysis of the EUVE and ROSAT data is consistent with a power-law spectrum of energy index alpha = 1.2 - 1.5, intervening column density N(sub H) = (5 - 8) x 10(exp 19)/sq cm, and luminosity 5.0 x 10(exp 30) ergs/s in the 0.1 - 2.4 keV band. We also use a bright EUVE/ROSAT source only 4.2 min. from the pulsar, the Seyfert galaxy RX J0437.4-4711 (= EUVE J0437-471 = IES 0435-472), to obtain an independent upper limit on the intervening absorption to the pulsar, N(sub H) less than 1.2 x 10(exp 20)/sq cm. Although a blackbody spectrum fails to fit the ROSAT data, two-component spectral fits to the combined EUVE/ROSAT data are used to limit the temperatures and surface areas of thermal emission that might make partial contributions to the flux. A hot polar cap of radius 50 - 600 m and temperature (1.0 - 3.3) x 10(exp 6) K could be present. Alternatively, a larger region with T = (4 - 12) x 10(exp 5) K and area less than 200 sq km, might contribute most of the EUVE and soft X-ray flux, but only if a hotter component were present as well. Any of these temperatures would require some mechanism(s) of surface reheating to be operating in this old pulsar, the most plausible being the impact of accelerated electrons and positrons onto the polar caps. The kinematically corrected spin-down power of PSR J0437-4715 is only 4 x 10(exp 33) ergs/s, which is an order of magnitude less than that of the lowest-luminosity gamma-ray pulsars Geminga and PSR B1055-52. The absence of high-energy gamma-rays from PSR J0437-4715 might signify an inefficient or dead outer gap accelerator, which in turn accounts for the lack of a more luminous reheated surface such as those intermediate-age gamma-ray pulsars may have.

Effect of plasma density around Io on local electron heating in the Io plasma torus

NASA Astrophysics Data System (ADS)

Tsuchiya, F.; Yoshioka, K.; Kagitani, M.; Kimura, T.; Murakami, G.; Yamazaki, A.; Misawa, H.; Kasaba, Y.; Yoshikawa, I.; Sakanoi, T.; Koga, R.; Ryo, A.; Suzuki, F.; Hikida, R.

2017-12-01

HISAKI observation of Io plasma torus (IPT) with extreme ultraviolet (EUV) wavelength range is a useful probe to access plasma environment in inner magnetosphere of Jupiter. Emissions from sulfur and oxygen ions in EUV range are caused by electron impact excitation and their intensity is well correlated with the abundance of hot electron in IPT. Previous observation showed that the brightness was enhanced downstream of the satellite Io, indicating that efficient electron heating takes place at Io and/or just downstream of Io. Detailed analysis of the emission intensity shows that the brightness depends on the magnetic longitude at Io and primary and secondary peaks appear in the longitude ranges of 100-130 and 250-340 degrees, respectively. The peak position and amplitude are slightly different between dawn and dusk sides. Here, we introduce inhomogeneous IPT density model in order to investigate relation between the emission intensity and local plasma density around Io in detail. An empirical IPT model is used for spatial distribution of ion and electron densities in the meridional plane. To include longitude and local time asymmetry in IPT, we consider (1)dawnward shift of IPT due to global convection electric field, (2) offset of Jupiter's dipole magnetic field, and (3) tilt of IPT with respect to Io's orbital plane. The modeled electron density at the position of Io as a function of magnetic longitude at Io shows similar profile with the ion emission intensity derived from the observation. This result suggests that energy extracted around Io and/or efficiency of electron heating is closely related to the plasma density around Io and longitude and local time dependences is explained by the spatial inhomogeneity of plasma density in IPT. A part of the energy extracted around Io could be transferred to the Jovian ionosphere along the magnetic field line and cause bright aurora spots and strong radio emissions.

Micro Coronal Bright Points Observed in the Quiet Magnetic Network by SOHO/EIT

NASA Technical Reports Server (NTRS)

Falconer, D. A.; Moore, R. L.; Porter, J. G.

1997-01-01

When one looks at SOHO/EIT Fe XII images of quiet regions, one can see the conventional coronal bright points (> 10 arcsec in diameter), but one will also notice many smaller faint enhancements in brightness (Figure 1). Do these micro coronal bright points belong to the same family as the conventional bright points? To investigate this question we compared SOHO/EIT Fe XII images with Kitt Peak magnetograms to determine whether the micro bright points are in the magnetic network and mark magnetic bipoles within the network. To identify the coronal bright points, we applied a picture frame filter to the Fe XII images; this brings out the Fe XII network and bright points (Figure 2) and allows us to study the bright points down to the resolution limit of the SOHO/EIT instrument. This picture frame filter is a square smoothing function (hlargelyalf a network cell wide) with a central square (quarter of a network cell wide) removed so that a bright point's intensity does not effect its own background. This smoothing function is applied to the full disk image. Then we divide the original image by the smoothed image to obtain our filtered image. A bright point is defined as any contiguous set of pixels (including diagonally) which have enhancements of 30% or more above the background; a micro bright point is any bright point 16 pixels or smaller in size. We then analyzed the bright points that were fully within quiet regions (0.6 x 0.6 solar radius) centered on disk center on six different days.

MINIFILAMENT ERUPTIONS THAT DRIVE CORONAL JETS IN A SOLAR ACTIVE REGION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sterling, Alphonse C.; Moore, Ronald L.; Falconer, David A.

We present observations of eruptive events in an active region adjacent to an on-disk coronal hole on 2012 June 30, primarily using data from the Solar Dynamics Observatory ( SDO )/Atmospheric Imaging Assembly (AIA), SDO /Helioseismic and Magnetic Imager (HMI), and STEREO - B . One eruption is of a large-scale (∼100″) filament that is typical of other eruptions, showing slow-rise onset followed by a faster-rise motion starting as flare emissions begin. It also shows an “EUV crinkle” emission pattern, resulting from magnetic reconnections between the exploding filament-carrying field and surrounding field. Many EUV jets, some of which are surges,more » sprays and/or X-ray jets, also occur in localized areas of the active region. We examine in detail two relatively energetic ones, accompanied by GOES M1 and C1 flares, and a weaker one without a GOES signature. All three jets resulted from small-scale (∼20″) filament eruptions consistent with a slow rise followed by a fast rise occurring with flare-like jet-bright-point brightenings. The two more-energetic jets showed crinkle patters, but the third jet did not, perhaps due to its weakness. Thus all three jets were consistent with formation via erupting minifilaments, analogous to large-scale filament eruptions and to X-ray jets in polar coronal holes. Several other energetic jets occurred in a nearby portion of the active region; while their behavior was also consistent with their source being minifilament eruptions, we could not confirm this because their onsets were hidden from our view. Magnetic flux cancelation and emergence are candidates for having triggered the minifilament eruptions.« less

The Rise and Fall of MU Velorum

NASA Astrophysics Data System (ADS)

Ayres, T. R.; Osten, R. A.; Brown, A.

1998-12-01

Mu Velorum (HD 93497) is a close visual pair consisting of a G5 III primary and a fainter companion, currently 2'' apart, with an orbital period of about 140 yr. The distance to the system is 36 pc. Mu Vel A is a 3 Msun giant, in the Hertzsprung gap beyond the ``rapid braking zone'' just redward of G0 III. Mu Vel recently was the source of a giant EUV flare, caught during a 12-day pointing in March 1998 by the Deep Survey telescope of the Extreme Ultraviolet Explorer. The outburst rose in less than half a day, and decayed with an e-folding time of several days. The peak flux, ~ 0.3 cnts s(-1) in the DS band 80--180 Angstroms, was approximately twice the quiescent level recorded during the previous ten days of observation. The size and long duration of the event are very unusual for a mid-G giant; in fact, more typical of the extremes seen among the hyperactive short-period RS Canum Venaticorum binaries. Although the secondary star is classified as a G2 V, published visual magnitude differences, and the enhanced 1900 Angstroms continuum (mu Vel was detected by IUE, but AB were not resolved), suggest that it falls earlier on the MS (perhaps F5 V) and indeed itself might be a pair. If mu Vel B is a short-period double, then arguably it could be the source of the giant flare. Unfortunately, little is known about the secondary owing to the small separation of the visual components of mu Vel, and their large difference in brightness. We discuss the flare event, EUV spectra obtained in quiescence and during the flare decay, and the nature of the puzzling secondary. [2mm] This work was supported by NASA grant NAG5-3226.

A Comet's Missing Light

NASA Astrophysics Data System (ADS)

Kohler, Susanna

2016-05-01

On 28 November 2013, comet C/2012 S1 better known as comet ISON should have passed within two solar radii of the Suns surface as it reached perihelion in its orbit. But instead of shining in extreme ultraviolet (EUV) wavelengths as it grazed the solar surface, the comet was never detected by EUV instruments. What happened to comet ISON?Missing EmissionWhen a sungrazing comet passes through the solar corona, it leaves behind a trail of molecules evaporated from its surface. Some of these molecules emit EUV light, which can be detected by instruments on telescopes like the space-based Solar Dynamics Observatory (SDO).Comet ISON, a comet that arrived from deep space and was predicted to graze the Suns corona in November 2013, was expected to cause EUV emission during its close passage. But analysis of the data from multiple telescopes that tracked ISON in EUV including SDO reveals no sign of it at perihelion.In a recent study, Paul Bryans and DeanPesnell, scientists from NCARs High Altitude Observatory and NASA Goddard Space Flight Center, try to determine why ISON didnt display this expected emission.Comparing ISON and LovejoyIn December 2011, another comet dipped into the Suns corona: comet Lovejoy. This image, showingthe orbit Lovejoy took around the Sun, is a composite of SDO images of the pre- and post-perihelion phases of the orbit. Click for a closer look! The dashed part of the curve represents where Lovejoy passed out of view behind the Sun. [Bryans Pesnell 2016]This is not the first time weve watched a sungrazing comet with EUV-detecting telescopes: Comet Lovejoy passed similarly close to the Sun in December 2011. But when Lovejoy grazed the solar corona, it emitted brightly in EUV. So why didnt ISON? Bryans and Pesnell argue that there are two possibilities:the coronal conditions experienced by the two comets were not similar, orthe two comets themselves were not similar.To establish which factor is the most relevant, the authors first demonstrate that both comets experienced very similar radiation fields as they passed perihelion. They also show that the properties of the Suns corona experienced by each comet like its density and magnetic field topology were roughly the same.Bryans and Pesnell argue that, as both comets appear to have encountered similar solar conditions, the most likely explanation for ISONs lack of detectable EUV emission is that it didnt deposit as much material in its orbit as Lovejoy did. They show that this would happen if ISONs nucleus were four times smaller in radius than Lovejoys, spanning a mere 5070 meters in comparison to Lovejoys 200300 meters.This conclusion is consistent with white-light observations of ISON that suggest that, though it might have started out significantly larger than Lovejoy, ISON underwent dramatic mass loss as it approached the Sun. By the time it arrived at perihelion, it was likely no longer large enough to create a strong EUV signal resulting in the non-detection of this elusive comet with SDO and other telescopes.CitationPaul Bryans and W. Dean Pesnell 2016 ApJ 822 77. doi:10.3847/0004-637X/822/2/77

Coronal loops and active region structure

NASA Technical Reports Server (NTRS)

Webb, D. F.; Zirin, H.

1981-01-01

Synoptic H-alpha Ca K, magnetograph and Skylab soft X-ray and EUV data were compared for the purpose of identifying the basic coronal magnetic structure of loops in a 'typical' active region and studying its evolution. A complex of activity in July 1973, especially McMath 12417, was emphasized. The principal results are: (1) most of the brightest loops connected the bright f plage to either the sunspot penumbra or to p satellite spots; no non-flaring X-ray loops end in umbrae; (2) short, bright loops had one or both ends in regions of emergent flux, strong field or high field gradients; (3) stable, strongly sheared loop arcades formed over filaments; (4) EFRs were always associated with compact X-ray arcades; and (5) loops connecting to other active regions had their bases in outlying plage of weak field strength in McM 417 where H-alpha fibrils marked the direction of the loops

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

NASA Astrophysics Data System (ADS)

Kozawa, Takahiro; Oizumi, Hiroaki; Itani, Toshiro; Tagawa, Seiichi

2010-11-01

The development of extreme ultraviolet (EUV) lithography has progressed owing to worldwide effort. As the development status of EUV lithography approaches the requirements for the high-volume production of semiconductor devices with a minimum line width of 22 nm, the extraction of resist parameters becomes increasingly important from the viewpoints of the accurate evaluation of resist materials for resist screening and the accurate process simulation for process and mask designs. In this study, we demonstrated that resist parameters (namely, quencher concentration, acid diffusion constant, proportionality constant of line edge roughness, and dissolution point) can be extracted from the scanning electron microscopy (SEM) images of patterned resists without the knowledge on the details of resist contents using two types of latest EUV resist.

Deceleration and dispersion of large-scale coronal bright fronts

NASA Astrophysics Data System (ADS)

Long, D. M.; Gallagher, P. T.; McAteer, R. T. J.; Bloomfield, D. S.

2011-07-01

Context. One of the most dramatic manifestations of solar activity are large-scale coronal bright fronts (CBFs) observed in extreme ultraviolet (EUV) images of the solar atmosphere. To date, the energetics and kinematics of CBFs remain poorly understood, due to the low image cadence and sensitivity of previous EUV imagers and the limited methods used to extract the features. Aims: In this paper, the trajectory and morphology of CBFs was determined in order to investigate the varying properties of a sample of CBFs, including their kinematics and pulse shape, dispersion, and dissipation. Methods: We have developed a semi-automatic intensity profiling technique to extract the morphology and accurate positions of CBFs in 2.5-10 min cadence images from STEREO/EUVI. The technique was applied to sequences of 171 Å and 195 Å images from STEREO/EUVI in order to measure the wave properties of four separate CBF events. Results: Following launch at velocities of ~240-450 km s-1 each of the four events studied showed significant negative acceleration ranging from ~-290 to -60 m s-2. The CBF spatial and temporal widths were found to increase from ~50 Mm to ~200 Mm and ~100 s to ~1500 s respectively, suggesting that they are dispersive in nature. The variation in position-angle averaged pulse-integrated intensity with propagation shows no clear trend across the four events studied. These results are most consistent with CBFs being dispersive magnetoacoustic waves. Figures 3-8, 10, 11, 13-15, 17, 18 and the movie are available in electronic form at http://www.aanda.org

Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems

NASA Astrophysics Data System (ADS)

Brux, O.; van der Walle, P.; van der Donck, J. C. J.; Dress, P.

2011-11-01

Extreme Ultraviolet Lithography (EUVL) is the most promising solution for technology nodes 16nm (hp) and below. However, several unique EUV mask challenges must be resolved for a successful launch of the technology into the market. Uncontrolled introduction of particles and/or contamination into the EUV scanner significantly increases the risk for device yield loss and potentially scanner down-time. With the absence of a pellicle to protect the surface of the EUV mask, a zero particle adder regime between final clean and the point-of-exposure is critical for the active areas of the mask. A Dual Pod concept for handling EUV masks had been proposed by the industry as means to minimize the risk of mask contamination during transport and storage. SuSS-HamaTech introduces MaskTrackPro InSync as a fully automated solution for the handling of EUV masks in and out of this Dual Pod System and therefore constitutes an interface between various tools inside the Fab. The intrinsic cleanliness of each individual handling and storage step of the inner shell (EIP) of this Dual Pod and the EUV mask inside the InSync Tool has been investigated to confirm the capability for minimizing the risk of cross-contamination. An Entegris Dual Pod EUV-1000A-A110 has been used for the qualification. The particle detection for the qualification procedure was executed with the TNO's RapidNano Particle Scanner, qualified for particle sizes down to 50nm (PSL equivalent). It has been shown that the target specification of < 2 particles @ 60nm per 25 cycles has been achieved. In case where added particles were measured, the EIP has been identified as a potential root cause for Ni particle generation. Any direct Ni-Al contact has to be avoided to mitigate the risk of material abrasion.

Debunking the Myth of Two-Temperature Coronae for RS CVn Systems Using Contemporaneous

NASA Astrophysics Data System (ADS)

Linsky, Jeffrey L.

For many years the standard analysis of low energy resolution x-ray observations of active late-type stars with the IPC, PSPC, TGS, and SSS has been to assume that the stellar coronae have plasma at only two temperatures. This type of analysis is constrained by the small information content and limited bandpass of the data but has NO PHYSICAL BASIS WHATSOEVER. We propose to test this hypothesis and to go beyond it to derive continuous emission measure distributions for the coronae of three very bright RS CVn systems (sigma-2 Cor Bor, UX Ari and VY Ari) using CONTEMPORANEOUS high resolution EUVE spectra and the improved x-ray energy resolution of ASCA. EUVE provides Fe lines with a broad range of ionization to derive the emission measure EM(T) independent of any uncertainties in the coronal abundances, while ASCA provides information on the hot plasma as seen in blended features of Mg, Si, S, and Fe and can test for coronal abundances different from the photosphere. We will model the quiescent and flare emission with magnetic loops.

Galileo Ultraviolet Spectrometer experiment

NASA Technical Reports Server (NTRS)

Hord, C. W.; Mcclintock, W. E.; Stewart, A. I. F.; Barth, C. A.; Esposito, L. W.; Thomas, G. E.; Sandel, B. R.; Hunten, D. M.; Broadfoot, A. L.; Shemansky, D. E.

1992-01-01

The Galileo ultraviolet spectrometer experiment uses data obtained by the Ultraviolet Spectrometer (UVS) mounted on the pointed orbiter scan platform and from the Extreme Ultraviolet Spectrometer (EUVS) mounted on the spinning part of the orbiter with the field of view perpendicular to the spin axis. The UVS is a Ebert-Fastie design that covers the range 113-432 nm with a wavelength resolution of 0.7 nm below 190 and 1.3 nm at longer wavelengths. The UVS spatial resolution is 0.4 deg x 0.1 deg for illuminated disk observations and 1 deg x 0.1 deg for limb geometries. The EUVS is a Voyager design objective grating spectrometer, modified to cover the wavelength range from 54 to 128 nm with wavelength resolution 3.5 nm for extended sources and 1.5 nm for point sources and spatial resolution of 0.87 deg x 0.17 deg. The EUVS instrument will follow up on the many Voyager UVS discoveries, particularly the sulfur and oxygen ion emissions in the Io torus and molecular and atomic hydrogen auroral and airglow emissions from Jupiter. The UVS will obtain spectra of emission, absorption, and scattering features in the unexplored, by spacecraft, 170-432 nm wavelength region. The UVS and EUVS instruments will provide a powerful instrument complement to investigate volatile escape and surface composition of the Galilean satellites, the Io plasma torus, micro- and macro-properties of the Jupiter clouds, and the composition structure and evolution of the Jupiter upper atmosphere.

Feasibility of using Extreme Ultraviolet Explorer (EUVE) reaction wheels to satisfy Space Infrared Telescope Facility (SIRTF) maneuver requirements

NASA Technical Reports Server (NTRS)

Lightsey, W. D.

1990-01-01

A digital computer simulation is used to determine if the extreme ultraviolet explorer (EUVE) reaction wheels can provide sufficient torque and momentum storage capability to meet the space infrared telescope facility (SIRTF) maneuver requirements. A brief description of the pointing control system (PCS) and the sensor and actuator dynamic models used in the simulation is presented. A model to represent a disturbance such as fluid sloshing is developed. Results developed with the simulation, and a discussion of these results are presented.

Probing the Quiet Solar Atmosphere from the Photosphere to the Corona

NASA Astrophysics Data System (ADS)

Kontogiannis, Ioannis; Gontikakis, Costis; Tsiropoula, Georgia; Tziotziou, Kostas

2018-04-01

We investigate the morphology and temporal variability of a quiet-Sun network region in different solar layers. The emission in several extreme ultraviolet (EUV) spectral lines through both raster and slot time-series, recorded by the EUV Imaging Spectrometer (EIS) on board the Hinode spacecraft is studied along with Hα observations and high-resolution spectropolarimetric observations of the photospheric magnetic field. The photospheric magnetic field is extrapolated up to the corona, showing a multitude of large- and small-scale structures. We show for the first time that the smallest magnetic structures at both the network and internetwork contribute significantly to the emission in EUV lines, with temperatures ranging from 8× 104 K to 6× 105 K. Two components of transition region emission are present, one associated with small-scale loops that do not reach coronal temperatures, and another component that acts as an interface between coronal and chromospheric plasma. Both components are associated with persistent chromospheric structures. The temporal variability of the EUV intensity at the network region is also associated with chromospheric motions, pointing to a connection between transition region and chromospheric features. Intensity enhancements in the EUV transition region lines are preferentially produced by Hα upflows. Examination of two individual chromospheric jets shows that their evolution is associated with intensity variations in transition region and coronal temperatures.

MULTI-VIEWPOINT OBSERVATIONS OF A WIDELY DISTRIBUTED SOLAR ENERGETIC PARTICLE EVENT: THE ROLE OF EUV WAVES AND WHITE-LIGHT SHOCK SIGNATURES

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kouloumvakos, A.; Patsourakos, S.; Nindos, A.

2016-04-10

On 2012 March 7, two large eruptive events occurred in the same active region within 1 hr from each other. Each consisted of an X-class flare, a coronal mass ejection (CME), an extreme-ultraviolet (EUV) wave, and a shock wave. The eruptions gave rise to a major solar energetic particle (SEP) event observed at widely separated (∼120°) points in the heliosphere. From multi-viewpoint energetic proton recordings we determine the proton release times at STEREO B and A (STB, STA) and the first Lagrange point (L1) of the Sun–Earth system. Using EUV and white-light data, we determine the evolution of the EUVmore » waves in the low corona and reconstruct the global structure and kinematics of the first CME’s shock, respectively. We compare the energetic proton release time at each spacecraft with the EUV waves’ arrival times at the magnetically connected regions and the timing and location of the CME shock. We find that the first flare/CME is responsible for the SEP event at all three locations. The proton release at STB is consistent with arrival of the EUV wave and CME shock at the STB footpoint. The proton release time at L1 was significantly delayed compared to STB. Three-dimensional modeling of the CME shock shows that the particle release at L1 is consistent with the timing and location of the shock’s western flank. This indicates that at L1 the proton release did not occur in low corona but farther away from the Sun. However, the extent of the CME shock fails to explain the SEP event observed at STA. A transport process or a significantly distorted interplanetary magnetic field may be responsible.« less

Dual-domain lateral shearing interferometer

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2004-03-16

The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.

Generation of coherent magnons in NiO stimulated by EUV pulses from a seeded free-electron laser

NASA Astrophysics Data System (ADS)

Simoncig, A.; Mincigrucci, R.; Principi, E.; Bencivenga, F.; Calvi, A.; Foglia, L.; Kurdi, G.; Matruglio, A.; Dal Zilio, S.; Masciotti, V.; Lazzarino, M.; Masciovecchio, C.

2017-12-01

The full comprehension of magnetic phenomena at the femtosecond (fs) time scale is of high demand for current material science and technology. Here we report the observation of coherent collective modes in the antiferromagnetic insulator nickel oxide (NiO) identified by a frequency of 0.86 THz, which matches the expected out-of-plane single-mode magnon resonance. Such collective excitations are inelastically stimulated by extreme ultraviolet (EUV) pulses delivered by a seeded free-electron laser (FEL) and subsequently revealed probing the transient optical activity of NiO looking at the Faraday effect. Moreover, the unique capability of the employed FEL source to deliver circularly polarized pulses allows us to demonstrate optomagnetic control of such collective modes at EUV photon energies. These results may set a starting point for future investigations of magnetic materials at time scales comparable or faster than those typical of exchange interactions.

Spectral characteristics of quantum-cascade laser operating at 10.6 μm wavelength for a seed application in laser-produced-plasma extreme UV source.

PubMed

Nowak, Krzysztof M; Ohta, Takeshi; Suganuma, Takashi; Yokotsuka, Toshio; Fujimoto, Junichi; Mizoguchi, Hakaru; Endo, Akira

2012-11-15

In this Letter, we investigate, for the first time to our knowledge, the spectral properties of a quantum-cascade laser (QCL) from a point of view of a new application as a laser seeder for a nanosecond-pulse high-repetition frequency CO(2) laser operating at 10.6 μm wavelength. The motivation for this work is a renewed interest in such a pulse format and wavelength driven by a development of extreme UV (EUV) laser-produced-plasma (LPP) sources. These sources use pulsed multikilowatt CO(2) lasers to drive the EUV-emitting plasmas. Basic spectral performance characteristics of a custom-made QCL chip are measured, such as tuning range and chirp rate. The QCL is shown to have all essential qualities of a robust seed source for a high-repetition nanosecond-pulsed CO(2) laser required by EUV LPP sources.

Coronal bright points in microwaves

NASA Technical Reports Server (NTRS)

Kundu, M. R.; Nitta, N.

1988-01-01

An excellent map of the quiet sun showing coronal bright points at 20-cm wavelength was produced using the VLA on February 13, 1987. The locations of bright points (BPs) were studied relative to features on the photospheric magnetogram and Ca K spectroheliogram. Most bright points appearing in the full 5-hour synthesized map are associated with small bipolar structures on the photospheric magnetogram; and the brightest part of a BP tends to lie on the boundary of a supergranulation network. The bright points exhibit rapid variations in intensity superposed on an apparently slow variation.

Temperature and EUV Intensity in a Coronal Prominence Cavity and Streamer

NASA Technical Reports Server (NTRS)

Kucera, T. A.; Gibson, S.E.; Schmit, D. J.; Landi, E.; Tripathi, D.

2012-01-01

We analyze the temperature and EUV line emission of a coronal cavity and surrounding streamer in terms of a morphological forward model. We use a series of iron line ratios observed with the Hinode Extreme-ultraviolet Imaging Spectrograph (EIS) on 2007 Aug. 9 to constrain temperature as a function of altitude in a morphological forward model of the streamer and cavity. We also compare model prediction of the EIS EUV line intensities and polarized brightness (pB) data from the Mauna Loa Solar Observatory (MLSO) MK4. This work builds on earlier analysis using the same model to determine geometry of and density in the same cavity and streamer. The fit to the data with altitude dependent temperature profiles indicates that both the streamer and cavity have temperatures in the range 1.4-1.7 MK. However, the cavity exhibits substantial substructure such that the altitude dependent temperature profile is not sufficient to completely model conditions in the cavity. Coronal prominence cavities are structured by magnetism so clues to this structure are to be found in their plasma properties. These temperature substructures are likely related to structures in the cavity magnetic field. Furthermore, we find that the model overestimates the line intensities by a factor of 4-10, while overestimating pB data by no more than a factor of 1.4. One possible explanation for this is that there may be a significant amount of material at temperatures outside of the range log T(K) approximately equals 5.8 - 6.7 in both the cavity and the streamer.

The Longitudinal Properties of a Solar Energetic Particle Event Investigated Using Modern Solar Imaging

NASA Technical Reports Server (NTRS)

Rouillard, A. P.; Sheeley, N.R. Jr.; Tylka, A.; Vourlidas, A.; Ng, C. K.; Rakowski, C.; Cohen, C. M. S.; Mewaldt, R. A.; Mason, G. M.; Reames, D.;

Relationship between resist outgassing and EUV witness sample contamination in NXE outgas qualification using electrons and EUV photons

NASA Astrophysics Data System (ADS)

Pollentier, I.; Tirumala Venkata, A.; Gronheid, R.

2014-04-01

EUV photoresists are considered as a potential source of optics contamination, since they introduce irradiation-induced outgassing in the EUV vacuum environment. Therefore, before these resists can be used on e.g. ASML NXE:3100 or NXE:3300, they need to be tested in dedicated equipment according to a well-defined procedure, which is based on exposing a witness sample (WS) in the vicinity of a simultaneously exposed resist as it outgasses. Different system infrastructures are used at multiple sites (e.g. NIST, CNSE, Sematech, EIDEC, and imec) and were calibrated to each other by a detailed test plan. Despite this detailed tool qualifications, a first round robin comparison of identical materials showed inconsistent outgas test results, and required further investigation by a second round robin. Since the resist exposure mode is different at the various locations (some sites are using EUV photons while others use E-gun electrons), this difference has always a point of concern for variability of test results. In this work we compare the outgas test results from EUV photon and electron exposure using the resist materials of the second round robin. Since the imec outgas tester allows both exposure methods on the resist, a within-system comparison is possible and showed limited variation between photon and electron exposure mode. Therefore the system-to-system variability amongst the different outgas test sites is expected to be related to other parameters than the electron/photon exposure mode. Initial work showed that the variability might be related to temperature, E-gun emission excursion, and/or residual outgassing scaled by different wafer areas at the different sites.

A very small and super strong zebra pattern burst at the beginning of a solar flare

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tan, Baolin; Tan, Chengming; Zhang, Yin

2014-08-01

Microwave emission with spectral zebra pattern structures (ZPs) is frequently observed in solar flares and the Crab pulsar. The previous observations show that ZP is a structure only overlapped on the underlying broadband continuum with slight increments and decrements. This work reports an unusually strong ZP burst occurring at the beginning of a solar flare observed simultaneously by two radio telescopes located in China and the Czech Republic and by the EUV telescope on board NASA's satellite Solar Dynamics Observatory on 2013 April 11. It is a very short and super strong explosion whose intensity exceeds several times that ofmore » the underlying flaring broadband continuum emission, lasting for just 18 s. EUV images show that the flare starts from several small flare bursting points (FBPs). There is a sudden EUV flash with extra enhancement in one of these FBPs during the ZP burst. Analysis indicates that the ZP burst accompanying an EUV flash is an unusual explosion revealing a strong coherent process with rapid particle acceleration, violent energy release, and fast plasma heating simultaneously in a small region with a short duration just at the beginning of the flare.« less

Magnetic topological analysis of coronal bright points

NASA Astrophysics Data System (ADS)

Galsgaard, K.; Madjarska, M. S.; Moreno-Insertis, F.; Huang, Z.; Wiegelmann, T.

2017-10-01

Context. We report on the first of a series of studies on coronal bright points which investigate the physical mechanism that generates these phenomena. Aims: The aim of this paper is to understand the magnetic-field structure that hosts the bright points. Methods: We use longitudinal magnetograms taken by the Solar Optical Telescope with the Narrowband Filter Imager. For a single case, magnetograms from the Helioseismic and Magnetic Imager were added to the analysis. The longitudinal magnetic field component is used to derive the potential magnetic fields of the large regions around the bright points. A magneto-static field extrapolation method is tested to verify the accuracy of the potential field modelling. The three dimensional magnetic fields are investigated for the presence of magnetic null points and their influence on the local magnetic domain. Results: In nine out of ten cases the bright point resides in areas where the coronal magnetic field contains an opposite polarity intrusion defining a magnetic null point above it. We find that X-ray bright points reside, in these nine cases, in a limited part of the projected fan-dome area, either fully inside the dome or expanding over a limited area below which typically a dominant flux concentration resides. The tenth bright point is located in a bipolar loop system without an overlying null point. Conclusions: All bright points in coronal holes and two out of three bright points in quiet Sun regions are seen to reside in regions containing a magnetic null point. An as yet unidentified process(es) generates the brigh points in specific regions of the fan-dome structure. The movies are available at http://www.aanda.org

Understanding Coronal Dimming and its Relation to Coronal Mass Ejections

NASA Astrophysics Data System (ADS)

Mason, J. P.; Woods, T. N.; Caspi, A.; Hock, R. A.

2013-12-01

When extreme ultraviolet (EUV) emitting material in the corona is lost during a coronal mass ejection (CME), the solar spectral irradiance is impacted and these effects are observed in data from the Solar Dynamics Observatory (SDO) EUV Variability Experiment (EVE) and Atmospheric Imaging Assembly (AIA). This process is one of the physical mechanisms that can lead to the observation of 'coronal dimming,' a phenomenon lasting eight hours on average and rarely persisting longer than one day. Other mechanisms that can cause observed dimming include obscuration of bright material (e.g., flare arcade) by dark material (e.g., filament), temperature evolution (e.g., cool plasma being heated causing transient decreases in characteristic emission lines), and propagation of global waves. Each of these processes has a unique spectral signature, which will be explained and exemplified. In particular, the 7 August 2010 M1.0 flare with associated ~870 km/s CME will be analyzed in detail using both AIA and EVE to demonstrate new techniques for isolating dimming due to the CME ('core dimming'). Further analysis will estimate CME mass and velocity using only parameterization of core dimming and compare these estimates to traditionally calculated CME kinetics.

A study of coronal bright points at 20 cm wavelength

NASA Technical Reports Server (NTRS)

Nitta, N.; Kundu, M. R.

1988-01-01

The paper presents the results of a study of coronal bright points observed at 20 cm with the VLA on a day when the sun was exceptionally quiet. Microwave maps of bright points were obtained using data for the entire observing period of 5 hours, as well as for shorter periods of a few minutes. Most bright points, especially those appearing in the full-period maps, appear to be associated with small bipolar structures on the photospheric magnetogram. Overlays of bright point (BP) maps on the Ca(+) K picture, show that the brightest part of BP tends to lie on the boundary of a supergranulation network.

Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

2016-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity (S or best energy BE) and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (LRS trade-off) among these parameters for chemically amplified resists (CARs). Here we present early proof-of-principle results for a multi-exposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a Photosensitized Chemically Amplified Resist (PSCAR). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV flood exposure (λ = 365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR and EL high performance requirements with the aim of resolving line space (L/S) features for the 7 and 5 nm logic node (16 nm and 13 nm half-pitch HP, respectively) for HVM. Several CARs were additionally found to be well resolved down to 12 nm and 11 nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and below 16 nm HP resolution, demonstrating the need for alternative resist solutions at 13 nm resolution and below. EUV interference lithography (IL) has provided and continues to provide a simple yet powerful platform for academic and industrial research enabling the characterization and development of new resist materials before commercial EUV exposure tools become available. Our experiments have been performed at the EUV-IL set-up in the Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI).

X-ray bright points and He I lambda 10830 dark points

NASA Technical Reports Server (NTRS)

Golub, L.; Harvey, K. L.; Herant, M.; Webb, D. F.

1989-01-01

Using near-simultaneous full disk Solar X-ray images and He I 10830 lambda, spectroheliograms from three recent rocket flights, dark points identified on the He I maps were compared with X-ray bright points identified on the X-ray images. It was found that for the largest and most obvious features there is a strong correlation: most He I dark points correspond to X-ray bright points. However, about 2/3 of the X-ray bright points were not identified on the basis of the helium data alone. Once an X-ray feature is identified it is almost always possible to find an underlying dark patch of enhanced He I absorption which, however, would not a priori have been selected as a dark point. Therefore, the He I dark points, using current selection criteria, cannot be used as a one-to-one proxy for the X-ray data. He I dark points do, however, identify the locations of the stronger X-ray bright points.

X-ray bright points and He I lambda 10830 dark points

NASA Technical Reports Server (NTRS)

Golub, L.; Harvey, K. L.; Herant, M.; Webb, D. F.

1989-01-01

Using near-simultaneous full disk Solar X-ray images and He I 10830 lambda, spectroheliograms from three recent rocket flights, dark points identified on the He I maps were compared with x-ray bright points identified on the X-ray images. It was found that for the largest and most obvious features there is a strong correlation: most He I dark points correspond to X-ray bright points. However, about 2/3 of the X-ray bright points were not identified on the basis of the helium data alone. Once an X-ray feature is identified it is almost always possible to find an underlying dark patch of enhanced He I absorption which, however, would not a priori have been selected as a dark point. Therefore, the He I dark points, using current selection criteria, cannot be used as a one-to-one proxy for the X-ray data. He I dark points do, however, identify the locations of the stronger X-ray bright points.

A CIRCULAR-RIBBON SOLAR FLARE FOLLOWING AN ASYMMETRIC FILAMENT ERUPTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Liu, Chang; Deng, Na; Lee, Jeongwoo

The dynamic properties of flare ribbons and the often associated filament eruptions can provide crucial information on the flaring coronal magnetic field. This Letter analyzes the GOES-class X1.0 flare on 2014 March 29 (SOL2014-03-29T17:48), in which we found an asymmetric eruption of a sigmoidal filament and an ensuing circular flare ribbon. Initially both EUV images and a preflare nonlinear force-free field model show that the filament is embedded in magnetic fields with a fan-spine-like structure. In the first phase, which is defined by a weak but still increasing X-ray emission, the western portion of the sigmoidal filament arches upward andmore » then remains quasi-static for about five minutes. The western fan-like and the outer spine-like fields display an ascending motion, and several associated ribbons begin to brighten. Also found is a bright EUV flow that streams down along the eastern fan-like field. In the second phase that includes the main peak of hard X-ray (HXR) emission, the filament erupts, leaving behind two major HXR sources formed around its central dip portion and a circular ribbon brightened sequentially. The expanding western fan-like field interacts intensively with the outer spine-like field, as clearly seen in running difference EUV images. We discuss these observations in favor of a scenario where the asymmetric eruption of the sigmoidal filament is initiated due to an MHD instability and further facilitated by reconnection at a quasi-null in corona; the latter is in turn enhanced by the filament eruption and subsequently produces the circular flare ribbon.« less

Prospective EUV observations of hot DA white dwarfs with the EUV Explorer

NASA Technical Reports Server (NTRS)

Finley, David S.; Malina, Roger F.; Bowyer, Stuart

1987-01-01

The Extreme Ultraviolet Explorer (EUVE) will perform a high sensitivity EUV all-sky survey. A major category of sources which will be detected with the EUVE instruments consists of hot white dwarfs. Detailed preliminary studies of synthetic EUV observations of white dwarfs have been carried out using the predicted EUVE instrumental response functions. Using available information regarding space densities of white dwarfs and the distribution of neutral hydrogen in the interstellar medium, the numbers of DA white dwarfs which will be detectable in the different EUV bandpasses have been estimated.

New Observations of Subarcsecond Photospheric Bright Points

NASA Technical Reports Server (NTRS)

Berger, T. E.; Schrijver, C. J.; Shine, R. A.; Tarbell, T. D.; Title, A. M.; Scharmer, G.

1995-01-01

We have used an interference filter centered at 4305 A within the bandhead of the CH radical (the 'G band') and real-time image selection at the Swedish Vacuum Solar Telescope on La Palma to produce very high contrast images of subarcsecond photospheric bright points at all locations on the solar disk. During the 6 day period of 15-20 Sept. 1993 we observed active region NOAA 7581 from its appearance on the East limb to a near-disk-center position on 20 Sept. A total of 1804 bright points were selected for analysis from the disk center image using feature extraction image processing techniques. The measured FWHM distribution of the bright points in the image is lognormal with a modal value of 220 km (0.30 sec) and an average value of 250 km (0.35 sec). The smallest measured bright point diameter is 120 km (0.17 sec) and the largest is 600 km (O.69 sec). Approximately 60% of the measured bright points are circular (eccentricity approx. 1.0), the average eccentricity is 1.5, and the maximum eccentricity corresponding to filigree in the image is 6.5. The peak contrast of the measured bright points is normally distributed. The contrast distribution variance is much greater than the measurement accuracy, indicating a large spread in intrinsic bright-point contrast. When referenced to an averaged 'quiet-Sun' area in the image, the modal contrast is 29% and the maximum value is 75%; when referenced to an average intergranular lane brightness in the image, the distribution has a modal value of 61% and a maximum of 119%. The bin-averaged contrast of G-band bright points is constant across the entire measured size range. The measured area of the bright points, corrected for pixelation and selection effects, covers about 1.8% of the total image area. Large pores and micropores occupy an additional 2% of the image area, implying a total area fraction of magnetic proxy features in the image of 3.8%. We discuss the implications of this area fraction measurement in the context of previously published measurements which show that typical active region plage has a magnetic filling factor on the order of 10% or greater. The results suggest that in the active region analyzed here, less than 50% of the small-scale magnetic flux tubes are demarcated by visible proxies such as bright points or pores.

[Influence of brightness value of supranasal point and apex nasi on dominant wavelength and excitation purity in complexion inspection of healthy adults].

PubMed

Zhu, Zhi-Rong; Zeng, Chang-Chun; Yang, Li; Liu, Han-Ping; Liu, Song-Hao

2011-12-01

In this study, to analyze the influence of the brightness value of the supranasal point and the apex nasi on their dominant wavelength and excitation purity according to the spectrocolorimetry data of the supranasal point and the apex nasi in healthy adults that were collected based on optical spectrum colorimetry. A total of 516 healthy adults were taken as the research subjects. The brightness, dominant wavelength and excitation purity values of the supranasal point and the apex nasi during the complexion inspection of subjects were calculated. This was based on the visible reflection spectrum, and the linear correlation/regression analysis between the brightness Y value and the dominant wavelength or excitation purity value. There was no correlation between the brightness Y value and the dominant wavelength of the normal supranasal point and the apex nasi; however, there was negative correlation between the brightness Y value and the excitation purity of the normal supranasal point and apex nasi. During the complexion inspection, the brightness Y value would not influence the dominant wavelength value, indicating that whiteness and/or blackness would not influence the normal individual complexion. However, the brightness Y value would influence the excitation purity of the supranasal point and the apex nasi, and the degree of saturation should be referred to as the brightness. This research provides a basic reference for diagnosing facial complexion in traditional Chinese medicine.

Effect of SPM-based cleaning POR on EUV mask performance

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

2011-11-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

2015-10-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface. Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning. Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

Characteristics of EUV Coronal Jets Observed with STEREO/SECCHI

NASA Astrophysics Data System (ADS)

Nisticò, G.; Bothmer, V.; Patsourakos, S.; Zimbardo, G.

2009-10-01

In this paper we present the first comprehensive statistical study of EUV coronal jets observed with the SECCHI (Sun Earth Connection Coronal and Heliospheric Investigation) imaging suites of the two STEREO spacecraft. A catalogue of 79 polar jets is presented, identified from simultaneous EUV and white-light coronagraph observations, taken during the time period March 2007 to April 2008, when solar activity was at a minimum. The twin spacecraft angular separation increased during this time interval from 2 to 48 degrees. The appearances of the coronal jets were always correlated with underlying small-scale chromospheric bright points. A basic characterization of the morphology and identification of the presence of helical structure were established with respect to recently proposed models for their origin and temporal evolution. Though each jet appeared morphologically similar in the coronagraph field of view, in the sense of a narrow collimated outward flow of matter, at the source region in the low corona the jet showed different characteristics, which may correspond to different magnetic structures. A classification of the events with respect to previous jet studies shows that amongst the 79 events there were 37 Eiffel tower-type jet events, commonly interpreted as a small-scale (˜35 arc sec) magnetic bipole reconnecting with the ambient unipolar open coronal magnetic fields at its loop tops, and 12 lambda-type jet events commonly interpreted as reconnection with the ambient field happening at the bipole footpoints. Five events were termed micro-CME-type jet events because they resembled the classical coronal mass ejections (CMEs) but on much smaller scales. The remaining 25 cases could not be uniquely classified. Thirty-one of the total number of events exhibited a helical magnetic field structure, indicative for a torsional motion of the jet around its axis of propagation. A few jets are also found in equatorial coronal holes. In this study we present sample events for each of the jet types using both, STEREO A and STEREO B, perspectives. The typical lifetimes in the SECCHI/EUVI ( Extreme UltraViolet Imager) field of view between 1.0 to 1.7 R ⊙ and in SECCHI/COR1 field of view between 1.4 to 4 R ⊙ are obtained, and the derived speeds are roughly estimated. In summary, the observations support the assumption of continuous small-scale reconnection as an intrinsic feature of the solar corona, with its role for the heating of the corona, particle acceleration, structuring and acceleration of the solar wind remaining to be explored in more detail in further studies.

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990

NASA Technical Reports Server (NTRS)

Hoover, Richard B. (Editor); Walker, Arthur B. C., Jr. (Editor)

1991-01-01

Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.

New Observations of Subarcsecond Photospheric Bright Points

NASA Technical Reports Server (NTRS)

Berger, T. E.; Schrijver, C. J.; Shine, R. A.; Tarbell, T. D.; Title, A. M.; Scharmer, G.

1995-01-01

We have used an interference filter centered at 4305 A within the bandhead of the CH radical (the 'G band') and real-time image selection at the Swedish Vacuum Solar Telescope on La Palma to produce very high contrast images of subarcsecond photospheric bright points at all locations on the solar disk. During the 6 day period of 1993 September 15-20 we observed active region NOAA 7581 from its appearance on the East limb to a near-disk-center position on September 20. A total of 1804 bright points were selected for analysis from the disk center image using feature extraction image processing techniques. The measured Full Width at Half Maximum (FWHM) distribution of the bright points in the image is lognormal with a modal value of 220 km (0 sec .30) and an average value of 250 km (0 sec .35). The smallest measured bright point diameter is 120 km (0 sec .17) and the largest is 600 km (O sec .69). Approximately 60% of the measured bright points are circular (eccentricity approx. 1.0), the average eccentricity is 1.5, and the maximum eccentricity corresponding to filigree in the image is 6.5. The peak contrast of the measured bright points is normally distributed. The contrast distribution variance is much greater than the measurement accuracy, indicating a large spread in intrinsic bright-point contrast. When referenced to an averaged 'quiet-Sun' area in the image, the modal contrast is 29% and the maximum value is 75%; when referenced to an average intergranular lane brightness in the image, the distribution has a modal value of 61% and a maximum of 119%. The bin-averaged contrast of G-band bright points is constant across the entire measured size range. The measured area of the bright points, corrected for pixelation and selection effects, covers about 1.8% of the total image area. Large pores and micropores occupy an additional 2% of the image area, implying a total area fraction of magnetic proxy features in the image of 3.8%. We discuss the implications of this area fraction measurement in the context of previously published measurements which show that typical active region plage has a magnetic filling factor on the order of 10% or greater. The results suggest that in the active region analyzed here, less than 50% of the small-scale magnetic flux tubes are demarcated by visible proxies such as bright points or pores.

Thermal energy creation and transport and X-ray/EUV emission in a thermodynamic MHD CME simulation

NASA Astrophysics Data System (ADS)

Reeves, K.; Mikic, Z.; Torok, T.; Linker, J.; Murphy, N. A.

2017-12-01

We model a CME using the PSI 3D numerical MHD code that includes coronal heating, thermal conduction and radiative cooling in the energy equation. The magnetic flux distribution at 1 Rs is produced by a localized subsurface dipole superimposed on a global dipole field, mimicking the presence of an active region within the global corona. We introduce transverse electric fields near the neutral line in the active region to form a flux rope, then a converging flow is imposed that causes the eruption. We follow the formation and evolution of the current sheet and find that instabilities set in soon after the reconnection commences. We simulate XRT and AIA EUV emission and find that the instabilities manifest as bright features emanating from the reconnection region. We examine the quantities responsible for plasma heating and cooling during the eruption, including thermal conduction, radiation, adiabatic compression and expansion, coronal heating and ohmic heating due to dissipation of currents. We find that the adiabatic compression plays an important role in heating the plasma around the current sheet, especially in the later stages of the eruption when the instabilities are present. Thermal conduction also plays an important role in the transport of thermal energy away from the current sheet region throughout the reconnection process.

Responses of Solar Irradiance and the Ionosphere to an Intense Activity Region

NASA Astrophysics Data System (ADS)

Chen, Yiding; Liu, Libo; Le, Huijun; Wan, Weixing

2018-03-01

Solar rotation (SR) variation dominates solar extremely ultraviolet (EUV) changes on the timescale of days. The F10.7 index is usually used as an indicator for solar EUV. The SR variation of F10.7 significantly enhanced during the 2008th-2009th Carrington rotations (CRs) owing to an intense active region; F10.7 increased about 180 units during that SR period. That was the most prominent SR variation of F10.7 during solar cycle 23. In this paper, global electron content (GEC) is used to investigate ionospheric response to that strong variation of solar irradiance indicated by F10.7. The variation of GEC with F10.7 was anomalous (GEC-F10.7 slope significantly decreased) during the 2008th-2009th CRs; however, GEC versus EUV variation during that period was consistent with that during adjacent time intervals when using Solar Heliospheric Observatory/Solar EUV Monitor 26-34 nm EUV measurements. The reason is that F10.7 response to that intense active region was much stronger than EUV response; thus, the EUV-F10.7 slope decreased. We confirmed decreased EUV-F10.7 slope during the 2008th-2009th CRs for different wavelengths within 27-120 nm using Thermosphere, Ionosphere, Mesosphere Energetics and Dynamics/Solar EUV Experiment high spectral resolution EUV measurements. And on the basis of Solar Heliospheric Observatory/Solar EUV Monitor EUV measurements during solar cycle 23, we further presented that EUV-F10.7 slope statistically tends to decrease when the SR variation of F10.7 significantly enhances. Moreover, we found that ionospheric time lag effect to EUV is exaggerated when using F10.7, owing to the time lag effect of EUV to F10.7.

Coronal bright points at 6cm wavelength

NASA Technical Reports Server (NTRS)

Fu, Qijun; Kundu, M. R.; Schmahl, E. J.

1988-01-01

Results are presented from observations of bright points at a wavelength of 6-cm using the VLA with a spatial resolution of 1.2 arcsec. During two hours of observations, 44 sources were detected with brightness temperatures between 2000 and 30,000 K. Of these sources, 27 are associated with weak dark He 10830 A features at distances less than 40 arcsecs. Consideration is given to variations in the source parameters and the relationship between ephemeral regions and bright points.

Spectroscopy of the extreme ultraviolet dayglow at 6.5A resolution - Atomic and ionic emissions between 530 and 1240A

NASA Technical Reports Server (NTRS)

Gentieu, E. P.; Feldman, P. D.; Meier, R. R.

1979-01-01

EUV spectra (530-1500A) of the day airglow in up, down and horizontal aspect orientations have been obtained with 6.5A resolution and a limiting sensitivity of 5R from a rocket experiment. Below 834A the spectrum is rich in previously unobserved OII transitions connecting with 4S(0), 2D(0), and 2P(0) states. Recent broad-band photometric observations of geocoronal HeI 584A emission in terms of the newly observed OII emissions are shown. The OI 989A and OI 1304A emissions exhibit similar dependence on altitude and viewing geometry with the OI 989A brightness 1/15 that of OI 1340. Emission at 1026A is identified as geocoronal HI Lyman beta rather than OI multiplet emission and observed intensities agree well with model estimates. An unexpectedly high NI 1200/NI 1134A brightness ratio is evidence of a significant contribution from photodissociative excitation of N2 to the NI 1200A source function.

Physical Conditions in the Solar Corona Derived from the Total Solar Eclipse Observations obtained on 2017 August 21 Using a Polarization Camera

NASA Astrophysics Data System (ADS)

Gopalswamy, N.; Yashiro, Seiji; Reginald, Nelson; Thakur, Neeharika; Thompson, Barbara J.; Gong, Qian

2018-01-01

We present preliminary results obtained by observing the solar corona during the 2017 August 21 total solar eclipse using a polarization camera mounted on an eight-inch Schmidt-Cassegrain telescope. The observations were made from Madras Oregon during 17:19 to 17:21 UT. Total and polarized brightness images were obtained at four wavelengths (385, 398.5, 410, and 423 nm). The polarization camera had a polarization mask mounted on a 2048x2048 pixel CCD with a pixel size of 7.4 microns. The resulting images had a size of 975x975 pixels because four neighboring pixels were summed to yield the polarization and total brightness images. The ratio of 410 and 385 nm images is a measure of the coronal temperature, while that at 423 and 398.5 nm images is a measure of the coronal flow speed. We compared the temperature map from the eclipse observations with that obtained from the Solar Dynamics Observatory’s Atmospheric Imaging Assembly images at six EUV wavelengths, yielding consistent temperature information of the corona.

Extreme ultraviolet explorer satellite observation of Jupiter's Io plasma torus

NASA Technical Reports Server (NTRS)

Hall, D. T; Gladstone, G. R.; Moos, H. W.; Bagenal, F.; Clarke, J. T.; Feldman, P. D.; Mcgrath, M. A.; Schneider, N. M.; Shemansky, D. E.; Strobel, D. F.

1994-01-01

We present the first Extreme Ultraviolet Explorer (EUVE) satellite observation of the Jupiter system, obtained during the 2 day period 1993 March 30 through April 1, which shows a rich emission-line spectrum from the Io plasma torus spanning wavelengths 370 to 735 A. The emission features correspond primarily to known multiplets of oxygen and sulfur ions, but a blended feature near 372 A is a plausible Na II transition. The summed detected energy flux of (7.2 +/- 0.2) x 10(exp -11) ergs/sq cm(s) corresponds to a radiated power of approximately equal to 4 x 10(exp 11) W in this spectral range. All ansa emissions show a distinct dawn-dusk brightness asymmetry and the measured dusk/dawn ratio of the bright S III lambda-680 feature is 2.3 +/- 0.3, significantly larger than the ratio measured by the Voyager spacecraft ultraviolet (UV) instruments. A preliminary estimate of ion partitioning indicates that the oxygen/sulfur ion ratio is approximately equal to 2, compared to the value approximately equal to 1.3 measured by Voyager, and that (Na(+))/(e) greater than 0.01.

A search for outflows from X-ray bright points in coronal holes

NASA Technical Reports Server (NTRS)

Mullan, D. J.; Waldron, W. L.

1986-01-01

Properties of X-ray bright points using two of the instruments on Solar Maximum Mission were investigated. The mass outflows from magnetic regions were modeled using a two dimensional MHD code. It was concluded that mass can be detected from X-ray bright points provided that the magnetic topology is favorable.

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-07-01

In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.

Analysis of EUVE Experiment Results

NASA Technical Reports Server (NTRS)

Horan, Stephen

1996-01-01

A series of tests to validate an antenna pointing concept for spin-stabilized satellites using a data relay satellite are described. These tests show that proper antenna pointing on an inertially-stabilized spacecraft can lead to significant access time through the relay satellite even without active antenna pointing. We summarize the test results, the simulations to model the effects of antenna pattern and space loss, and the expected contact times. We also show how antenna beam width affects the results.

Fabrication of nanoscale patterns in lithium fluoride crystal using a 13.5 nm Schwarzschild objective and a laser produced plasma source.

PubMed

Wang, Xin; Mu, Baozhong; Jiang, Li; Zhu, Jingtao; Yi, Shengzhen; Wang, Zhanshan; He, Pengfei

2011-12-01

Lithium fluoride (LiF) crystal is a radiation sensitive material widely used as EUV and soft x-ray detector. The LiF-based detector has high resolution, in principle limited by the point defect size, large field of view, and wide dynamic range. Using LiF crystal as an imaging detector, a resolution of 900 nm was achieved by a projection imaging of test meshes with a Schwarzschild objective operating at 13.5 nm. In addition, by imaging of a pinhole illuminated by the plasma, an EUV spot of 1.5 μm diameter in the image plane of the objective was generated, which accomplished direct writing of color centers with resolution of 800 nm. In order to avoid sample damage and contamination due to the influence of huge debris flux produced by the plasma source, a spherical normal-incidence condenser was used to collect EUV radiation. Together with a description of experimental results, the development of the Schwarzschild objective, the influence of condenser on energy density and the alignment of the imaging system are also reported.

Extreme Ultraviolet Explorer observations of the magnetic cataclysmic variable RE 1938-461

NASA Technical Reports Server (NTRS)

Warren, John K.; Vallerga, John V.; Mauche, Christopher W.; Mukai, Koji; Siegmund, Oswald H. W.

1993-01-01

The magnetic cataclysmic variable RE 1938-461 was observed by the Extreme Ultraviolet Explorer (EUVE) Deep Survey instrument on 1992 July 8-9 during in-orbit calibration. It was detected in the Lexan/ boron (65-190 A) band, with a quiescent count rate of 0.0062 +/- 0.0017/s, and was not detected in the aluminum/carbon (160-360 A) band. The Lexan/boron count rate is lower than the corresponding ROSAT wide-field camera Lexan/boron count rate. This is consistent with the fact that the source was in a low state during an optical observation performed just after the EUVE observation, whereas it was in an optical high state during the ROSAT observation. The quiescent count rates are consistent with a virtual cessation of accretion. Two transient events lasting about 1 hr occurred during the Lexan/boron pointing, the second at a count rate of 0.050 +/- 0.006/s. This appears to be the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. We propose two possible explanations for the transient events.

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

2016-07-01

Extreme ultraviolet lithography (EUVL, λ=13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high-power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity [S or best energy (BE)], and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (line width roughness, resolution and sensitivity trade-off) among these parameters for chemically amplified resists (CARs). We present early proof-of-principle results for a multiexposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a "Photosensitized Chemically Amplified Resist™" (PSCAR™). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV-flood exposure (λ=365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR, and EL high-performance requirements with the aim of resolving line space (L/S) features for the 7- and 5-nm logic node [16- and 13-nm half-pitch (HP), respectively] for HVM. Several CARs were additionally found to be well resolved down to 12- and 11-nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and below 16-nm HP resolution, demonstrating the need for alternative resist solutions at 13-nm resolution and below. EUV interference lithography (IL) has provided and continues to provide a simple yet powerful platform for academic and industrial research, enabling the characterization and development of resist materials before commercial EUV exposure tools become available. Our experiments have been performed at the EUV-IL set-up in the Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI).

Quality control of EUVE databases

NASA Technical Reports Server (NTRS)

John, L. M.; Drake, J.

1992-01-01

The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

Non-astigmatic imaging with matched pairs of spherically bent reflectors

DOEpatents

Bitter, Manfred Ludwig [Princeton, NJ; Hill, Kenneth Wayne [Plainsboro, NJ; Scott, Steven Douglas [Wellesley, MA; Feder, Russell [Newton, PA; Ko, Jinseok [Cambridge, MA; Rice, John E [N. Billerica, MA; Ince-Cushman, Alexander Charles [New York, NY; Jones, Frank [Manalapan, NJ

2012-07-10

Arrangements for the point-to-point imaging of a broad spectrum of electromagnetic radiation and ultrasound at large angles of incidence employ matched pairs of spherically bent reflectors to eliminate astigmatic imaging errors. Matched pairs of spherically bent crystals or spherically bent multi-layers are used for X-rays and EUV radiation; and matched pairs of spherically bent mirrors that are appropriate for the type of radiation are used with microwaves, infrared and visible light, or ultrasound. The arrangements encompass the two cases, where the Bragg angle--the complement to the angle of incidence in optics--is between 45.degree. and 90.degree. on both crystals/mirrors or between 0.degree. and 45.degree. on the first crystal/mirror and between 45.degree. and 90.degree. on the second crystal/mirror, where the angles of convergence and divergence are equal. For x-rays and EUV radiation, also the Bragg condition is satisfied on both spherically bent crystals/multi-layers.

Non-magnetic photospheric bright points in 3D simulations of the solar atmosphere

NASA Astrophysics Data System (ADS)

Calvo, F.; Steiner, O.; Freytag, B.

2016-11-01

Context. Small-scale bright features in the photosphere of the Sun, such as faculae or G-band bright points, appear in connection with small-scale magnetic flux concentrations. Aims: Here we report on a new class of photospheric bright points that are free of magnetic fields. So far, these are visible in numerical simulations only. We explore conditions required for their observational detection. Methods: Numerical radiation (magneto-)hydrodynamic simulations of the near-surface layers of the Sun were carried out. The magnetic field-free simulations show tiny bright points, reminiscent of magnetic bright points, only smaller. A simple toy model for these non-magnetic bright points (nMBPs) was established that serves as a base for the development of an algorithm for their automatic detection. Basic physical properties of 357 detected nMBPs were extracted and statistically evaluated. We produced synthetic intensity maps that mimic observations with various solar telescopes to obtain hints on their detectability. Results: The nMBPs of the simulations show a mean bolometric intensity contrast with respect to their intergranular surroundings of approximately 20%, a size of 60-80 km, and the isosurface of optical depth unity is at their location depressed by 80-100 km. They are caused by swirling downdrafts that provide, by means of the centripetal force, the necessary pressure gradient for the formation of a funnel of reduced mass density that reaches from the subsurface layers into the photosphere. Similar, frequently occurring funnels that do not reach into the photosphere, do not produce bright points. Conclusions: Non-magnetic bright points are the observable manifestation of vertically extending vortices (vortex tubes) in the photosphere. The resolving power of 4-m-class telescopes, such as the DKIST, is needed for an unambiguous detection of them. The movie associated to Fig. 1 is available at http://www.aanda.org

Spectroscopic Study of a Dark Lane and a Cool Loop in a Solar Limb Active Region by Hinode/EIS

NASA Astrophysics Data System (ADS)

Lee, K.; Imada, S.; Moon, Y.; Lee, J.

2012-12-01

We investigate a cool loop and a dark lane over a limb active region on 2007 March 14 by the Hinode/EUV Imaging Spectrometer (EIS). The cool loop is clearly seen in the EIS spectral lines formed at the transition region temperature (log T = 5.8). The dark lane is characterized by an elongated faint structure in coronal spectral lines (log T = 5.8 - 6.1) and rooted on a bright point. We examine their electron densities, Doppler velocities, and non-thermal velocities as a function of distance from the limb using the spectral lines formed at different temperatures (log T = 5.4 - 6.4). The electron densities of the cool loop and the dark lane are derived from the density sensitive line pairs of Mg VII, Fe XII, and Fe XIV spectra. Under the hydrostatic equilibrium and isothermal assumption, we determine their temperatures from the density scale height. Comparing the scale height temperatures to the peak formation temperatures of the spectral lines, we note that the scale height temperature of the cool loop is consistent with a peak formation temperature of the Mg VII (log T = 5.8) and the scale height temperature of the dark lane is close to a peak formation temperature of the Fe XII and Fe XIII (log T = 6.1 - 6.2). It is interesting to note that the structures of the cool loop and the dark lane are most visible in these temperature lines. While the non-thermal velocity in the cool loop slightly decreases (less than 7 km {s-1}) along the loop, that in the dark lane sharply falls off with height. The variation of non-thermal velocity with height in the cool loop and the dark lane is contrast to that in off-limb polar coronal holes which are considered as source of the fast solar wind. Such a decrease in the non-thermal velocity may be explained by wave damping near the solar surface or turbulence due to magnetic reconnection near the bright point.

Direct diode pumped Ti:sapphire ultrafast regenerative amplifier system

DOE PAGES

Backus, Sterling; Durfee, Charles; Lemons, Randy; ...

2017-02-10

Here, we report on a direct diode-pumped Ti:sapphire ultrafast regenerative amplifier laser system producing multi-uJ energies with repetition rate from 50 to 250 kHz. By combining cryogenic cooling of Ti:sapphire with high brightness fiber-coupled 450nm laser diodes, we for the first time demonstrate a power-scalable CW-pumped architecture that can be directly applied to demanding ultrafast applications such as coherent high-harmonic EUV generation without any complex post-amplification pulse compression. Initial results promise a new era for Ti:sapphire amplifiers not only for ultrafast laser applications, but also for tunable CW sources. We discuss the unique challenges to implementation, as well as themore » solutions to these challenges.« less

Direct diode pumped Ti:sapphire ultrafast regenerative amplifier system

DOE Office of Scientific and Technical Information (OSTI.GOV)

Backus, Sterling; Durfee, Charles; Lemons, Randy

Here, we report on a direct diode-pumped Ti:sapphire ultrafast regenerative amplifier laser system producing multi-uJ energies with repetition rate from 50 to 250 kHz. By combining cryogenic cooling of Ti:sapphire with high brightness fiber-coupled 450nm laser diodes, we for the first time demonstrate a power-scalable CW-pumped architecture that can be directly applied to demanding ultrafast applications such as coherent high-harmonic EUV generation without any complex post-amplification pulse compression. Initial results promise a new era for Ti:sapphire amplifiers not only for ultrafast laser applications, but also for tunable CW sources. We discuss the unique challenges to implementation, as well as themore » solutions to these challenges.« less

On the Relation Between Facular Bright Points and the Magnetic Field

NASA Astrophysics Data System (ADS)

Berger, Thomas; Shine, Richard; Tarbell, Theodore; Title, Alan; Scharmer, Goran

1994-12-01

Multi-spectral images of magnetic structures in the solar photosphere are presented. The images were obtained in the summers of 1993 and 1994 at the Swedish Solar Telescope on La Palma using the tunable birefringent Solar Optical Universal Polarimeter (SOUP filter), a 10 Angstroms wide interference filter tuned to 4304 Angstroms in the band head of the CH radical (the Fraunhofer G-band), and a 3 Angstroms wide interference filter centered on the Ca II--K absorption line. Three large format CCD cameras with shuttered exposures on the order of 10 msec and frame rates of up to 7 frames per second were used to create time series of both quiet and active region evolution. The full field--of--view is 60times 80 arcseconds (44times 58 Mm). With the best seeing, structures as small as 0.22 arcseconds (160 km) in diameter are clearly resolved. Post--processing of the images results in rigid coalignment of the image sets to an accuracy comparable to the spatial resolution. Facular bright points with mean diameters of 0.35 arcseconds (250 km) and elongated filaments with lengths on the order of arcseconds (10(3) km) are imaged with contrast values of up to 60 % by the G--band filter. Overlay of these images on contemporal Fe I 6302 Angstroms magnetograms and Ca II K images reveals that the bright points occur, without exception, on sites of magnetic flux through the photosphere. However, instances of concentrated and diffuse magnetic flux and Ca II K emission without associated bright points are common, leading to the conclusion that the presence of magnetic flux is a necessary but not sufficient condition for the occurence of resolvable facular bright points. Comparison of the G--band and continuum images shows a complex relation between structures in the two bandwidths: bright points exceeding 350 km in extent correspond to distinct bright structures in the continuum; smaller bright points show no clear relation to continuum structures. Size and contrast statistical cross--comparisons compiled from measurements of over two-thousand bright point structures are presented. Preliminary analysis of the time evolution of bright points in the G--band reveals that the dominant mode of bright point evolution is fission of larger structures into smaller ones and fusion of small structures into conglomerate structures. The characteristic time scale for the fission/fusion process is on the order of minutes.

Large-Scale Coronal Heating from the Solar Magnetic Network

NASA Technical Reports Server (NTRS)

Falconer, David A.; Moore, Ronald L.; Porter, Jason G.; Hathaway, David H.

1999-01-01

In Fe 12 images from SOHO/EIT, the quiet solar corona shows structure on scales ranging from sub-supergranular (i.e., bright points and coronal network) to multi- supergranular. In Falconer et al 1998 (Ap.J., 501, 386) we suppressed the large-scale background and found that the network-scale features are predominantly rooted in the magnetic network lanes at the boundaries of the supergranules. The emission of the coronal network and bright points contribute only about 5% of the entire quiet solar coronal Fe MI emission. Here we investigate the large-scale corona, the supergranular and larger-scale structure that we had previously treated as a background, and that emits 95% of the total Fe XII emission. We compare the dim and bright halves of the large- scale corona and find that the bright half is 1.5 times brighter than the dim half, has an order of magnitude greater area of bright point coverage, has three times brighter coronal network, and has about 1.5 times more magnetic flux than the dim half These results suggest that the brightness of the large-scale corona is more closely related to the large- scale total magnetic flux than to bright point activity. We conclude that in the quiet sun: (1) Magnetic flux is modulated (concentrated/diluted) on size scales larger than supergranules. (2) The large-scale enhanced magnetic flux gives an enhanced, more active, magnetic network and an increased incidence of network bright point formation. (3) The heating of the large-scale corona is dominated by more widespread, but weaker, network activity than that which heats the bright points. This work was funded by the Solar Physics Branch of NASA's office of Space Science through the SR&T Program and the SEC Guest Investigator Program.

3D structure and kinematics characteristics of EUV wave front

NASA Astrophysics Data System (ADS)

Podladchikova, T.; Veronig, A.; Dissauer, K.

2017-12-01

We present 3D reconstructions of EUV wave fronts using multi-point observations from the STEREO-A and STEREO-B spacecraft. EUV waves are large-scale disturbances in the solar corona that are initiated by coronal mass ejections, and are thought to be large-amplitude fast-mode MHD waves or shocks. The aim of our study is to investigate the dynamic evolution of the 3D structure and wave kinematics of EUV wave fronts. We study the events on December 7, 2007 and February 13, 2009 using data from the STEREO/EUVI-A and EUVI-B instruments in the 195 Å filter. The proposed approach is based on a complementary combination of epipolar geometry of stereo vision and perturbation profiles. We propose two different solutions to the matching problem of the wave crest on images from the two spacecraft. One solution is suitable for the early and maximum stage of event development when STEREO-A and STEREO-B see the different facets of the wave, and the wave crest is clearly outlined. The second one is applicable also at the later stage of event development when the wave front becomes diffuse and is faintly visible. This approach allows us to identify automatically the segments of the diffuse front on pairs of STEREO-A and STEREO-B images and to solve the problem of identification and matching of the objects. We find that the EUV wave observed on December 7, 2007 starts with a height of 30-50 Mm, sharply increases to a height of 100-120 Mm about 10 min later, and decreases to 10-20 Mm in the decay phase. Including the 3D evolution of the EUV wave front allowed us to correct the wave kinematics for projection and changing height effects. The velocity of the wave crest (V=215-266 km/s) is larger than the trailing part of the wave pulse (V=103-163 km/s). For the February 9, 2009 event, the upward movement of the wave crest shows an increase from 20 to 100 Mm over a period of 30 min. The velocity of wave crest reaches values of 208-211 km/s.

A Search for EUV Emission from the O4f Star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1996-01-01

We obtained a 140 ks EUVE observation of the O4f star, zeta Puppis. Because of its low ISM column density and highly ionized stellar wind, a unique EUV window is accessible for viewing between 128 to 140 A, suggesting that this star may he the only O star observable with the EUVE. Although no SW spectrometer wavelength bin had a signal to noise greater than 3, a bin at 136 A had a signal to noise of 2.4. This bin is where models predict the brightest line due to OV emission should occur. We present several EUV line emission models. These models were constrained by fitting the ROSAT PSPC X-ray data and our EUVE data. If the OV emission is real, the best fits to the data suggest that there are discrepancies in our current understanding of EUV/X-ray production mechanisms. In particular, the emission measure of the EUV source is found to be much greater than the total wind emission measure, suggesting that the EUV shock must produce a very large density enhancement. In addition, the location of the EUV and X-ray shocks are found to be separated by approx. 0.3 stellar radii, but the EUV emission region is found to be approx. 400 times larger than the X-ray emission region. We also discuss the implications of a null detection and present relevant upper limits.

Anticorrelation of X-ray bright points with sunspot number, 1970-1978

NASA Technical Reports Server (NTRS)

Golub, L.; Davis, J. M.; Krieger, A. S.

1979-01-01

Soft X-ray observations of the solar corona over the period 1970-1978 show that the number of small short-lived bipolar magnetic features (X-ray bright points) varies inversely with the sunspot index. During the entire period from 1973 to 1978 most of the magnetic flux emerging at the solar surface appeared in the form of bright points. In 1970, near the peak of solar cycle 20, the contributions from bright points and from active regions appear to be approximately equal. These observations strongly support an earlier suggestion that the solar cycle may be characterized as an oscillator in wave-number space with relatively little variation in the average total rate of flux emergence.

Monolithic pattern-sensitive detector

DOEpatents

Berger, Kurt W.

2000-01-01

Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

Selected highlights from the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1995-01-01

We present a few scientific highlights from the Extreme Ultraviolet Explorer (EUVE) all-sky and deep surveys, from the EUVE Righ Angle Program, and from the EUVE Guest Observer Program. The First EUVE Source Catalog includes 410 extreme ultraviolet (EUV) sources detected in the initial processing of the EUVE all-sky data. A program of optical identification indicates that counterparts include cool star coronae, flare stars, hot white dwarfs, central stars of planetary nebulae, B star photospheres and winds, an X-ray binary, extragalactic objects (active galactic nuclei, BL Lacertae), solar system objects (Moon, Mars, Io,), supernova remnants, and two novae.

Analytical techniques for mechanistic characterization of EUV photoresists

NASA Astrophysics Data System (ADS)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

The plasma filling factor of coronal bright points. II. Combined EIS and TRACE results

NASA Astrophysics Data System (ADS)

Dere, K. P.

2009-04-01

Aims: In a previous paper, the volumetric plasma filling factor of coronal bright points was determined from spectra obtained with the Extreme ultraviolet Imaging Spectrometer (EIS). The analysis of these data showed that the median plasma filling factor was 0.015. One interpretation of this result was that the small filling factor was consistent with a single coronal loop with a width of 1-2´´, somewhat below the apparent width. In this paper, higher spatial resolution observations with the Transition Region and Corona Explorer (TRACE) are used to test this interpretation. Methods: Rastered spectra of regions of the quiet Sun were recorded by the EIS during operations with the Hinode satellite. Many of these regions were simultaneously observed with TRACE. Calibrated intensities of Fe xii lines were obtained and images of the quiet corona were constructed from the EIS measurements. Emission measures were determined from the EIS spectra and geometrical widths of coronal bright points were obtained from the TRACE images. Electron densities were determined from density-sensitive line ratios measured with EIS. A comparison of the emission measure and bright point widths with the electron densities yielded the plasma filling factor. Results: The median electron density of coronal bright points is 3 × 109 cm-3 at a temperature of 1.6 × 106 K. The volumetric plasma filling factor of coronal bright points was found to vary from 3 × 10-3 to 0.3 with a median value of 0.04. Conclusions: The current set of EIS and TRACE coronal bright-point observations indicate the median value of their plasma filling factor is 0.04. This can be interpreted as evidence of a considerable subresolution structure in coronal bright points or as the result of a single completely filled plasma loop with widths on the order of 0.2-1.5´´ that has not been spatially resolved in these measurements.

Extended surface parallel coating inspection method

DOEpatents

Naulleau, Patrick P.

2006-03-21

Techniques for rapidly characterizing reflective surfaces and especially multi-layer EUV reflective surfaces of optical components involve illuminating the entire reflective surface instantaneously and detecting the image far field. The technique provides a mapping of points on the reflective surface to corresponding points on a detector, e.g., CCD. This obviates the need to scan a probe over the entire surface of the optical component. The reflective surface can be flat, convex, or concave.

Mask fabrication and its applications to extreme ultra-violet diffractive optics

NASA Astrophysics Data System (ADS)

Cheng, Yang-Chun

Short-wavelength radiation around 13nm of wavelength (Extreme Ultra-Violet, EUV) is being considered for patterning microcircuits, and other electronic chips with dimensions in the nanometer range. Interferometric Lithography (IL) uses two beams of radiation to form high-resolution interference fringes, as small as half the wavelength of the radiation used. As a preliminary step toward manufacturing technology, IL can be used to study the imaging properties of materials in a wide spectral range and at nanoscale dimensions. A simple implementation of IL uses two transmission diffraction gratings to form the interference pattern. More complex interference patterns can be created by using different types of transmission gratings. In this thesis, I describe the development of a EUV lithography system that uses diffractive optical elements (DOEs), from simple gratings to holographic structures. The exposure system is setup on a EUV undulator beamline at the Synchrotron Radiation Center, in the Center for NanoTechnology clean room. The setup of the EUV exposure system is relatively simple, while the design and fabrication of the DOE "mask" is complex, and relies on advanced nanofabrication techniques. The EUV interferometric lithography provides reliable EUV exposures of line/space patterns and is ideal for the development of EUV resist technology. In this thesis I explore the fabrication of these DOE for the EUV range, and discuss the processes I have developed for the fabrication of ultra-thin membranes. In addition, I discuss EUV holographic lithography and generalized Talbot imaging techniques to extend the capability of our EUV-IL system to pattern arbitrary shapes, using more coherent sources than the undulator. In a series of experiments, we have demonstrated the use of a soft X-ray (EUV) laser as effective source for EUV lithography. EUV-IL, as implemented at CNTech, is being used by several companies and research organizations to characterize photoresist materials.

Surface Inhomogeneities of the White Dwarf in the Binary EUVE J2013+400

NASA Astrophysics Data System (ADS)

Vennes, Stephane

We propose to study the white dwarf in the binary EUVE J2013+400. The object is paired with a dMe star and new extreme ultraviolet (EUV) observations will offer critical insights into the properties of the white dwarf. The binary behaves, in every other aspects, like its siblings EUVE J0720-317 and EUVE J1016-053 and new EUV observations will help establish their class properties; in particular, EUV photometric variations in 0720-317 and 1016-053 over a period of 11 hours and 57 minutes, respectively, are indicative of surface abundance inhomogeneities coupled with the white dwarfs rotation period. These variations and their large photospheric helium abundance are best explained by a diffusion-accretion model in which time-variable accretion and possible coupling to magnetic poles contribute to abundance variations across the surface and possibly as a function of depth. EUV spectroscopy will also enable a study of the helium abundance as a function of depth and a detailed comparison with theoretical diffusion profile.

Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

NASA Astrophysics Data System (ADS)

Tasdemir, Zuhal; Mochi, Iacopo; Olvera, Karen Garrido; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Fallica, Roberto; Vockenhuber, Michaela; Ekinci, Yasin

2017-10-01

Extreme UV lithography (EUVL) has gained considerable attention for several decades as a potential technology for the semiconductor industry and it is now close to being adopted in high-volume manufacturing. At Paul Scherrer Institute (PSI), we have focused our attention on EUV resist performance issues by testing available high-performance EUV resists in the framework of a joint collaboration with ASML. For this purpose, we use the grating-based EUV-IL setup installed at the Swiss Light Source (SLS) at PSI, in which a coherent beam with 13.5 nm wavelength is used to produce a periodic aerial image with virtually 100% contrast and large depth of focus. Interference lithography is a relatively simple technique and it does not require many optical components, therefore the unintended flare is minimized and the aerial image is well-defined sinusoidal pattern. For the collaborative work between PSI and ASML, exposures are being performed on the EUV-IL exposure tool at PSI. For better quantitative comparison to the NXE scanner results, it is targeted to determine the actual NILS of the EUV-IL exposure tool at PSI. Ultimately, any resist-related metrology must be aligned and compared with the performance of EUV scanners. Moreover, EUV-IL is a powerful method for evaluating the resist performance and a resist which performs well with EUV-IL, shows, in general, also good performance with NXE scanners. However, a quantitative prediction of the performance based on EUV-IL measurements has not been possible due to the differences in aerial image formation. In this work, we aim to study the performance of EUV resists with different aerial images. For this purpose, after the real interference pattern exposure, we overlay a flat field exposure to emulate different levels of contrast. Finally, the results are compared with data obtained from EUV scanner. This study will enable not only match the data obtained from EUV- IL at PSI with the performance of NXE scanners, but also a better understanding of resist fundamentals by studying the effects of the aerial image on resist performance by changing the aerial image contrast in a controlled manner using EUV-IL.

A new mask exposure and analysis facility

NASA Astrophysics Data System (ADS)

te Sligte, Edwin; Koster, Norbert; Deutz, Alex; Staring, Wilbert

2014-10-01

The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

Soft x-ray submicron imaging detector based on point defects in LiF

DOE Office of Scientific and Technical Information (OSTI.GOV)

Baldacchini, G.; Bollanti, S.; Bonfigli, F.

2005-11-15

The use of lithium fluoride (LiF) crystals and films as imaging detectors for EUV and soft-x-ray radiation is discussed. The EUV or soft-x-ray radiation can generate stable color centers, emitting in the visible spectral range an intense fluorescence from the exposed areas. The high dynamic response of the material to the received dose and the atomic scale of the color centers make this detector extremely interesting for imaging at a spatial resolution which can be much smaller than the light wavelength. Experimental results of contact microscopy imaging of test meshes demonstrate a resolution of the order of 400 nm. Thismore » high spatial resolution has been obtained in a wide field of view, up to several mm{sup 2}. Images obtained on different biological samples, as well as an investigation of a soft x-ray laser beam are presented. The behavior of the generated color centers density as a function of the deposited x-ray dose and the advantages of this new diagnostic technique for both coherent and noncoherent EUV sources, compared with CCDs detectors, photographic films, and photoresists are discussed.« less

Novel EUV photoresist for sub-7nm node (Conference Presentation)

NASA Astrophysics Data System (ADS)

Furukawa, Tsuyoshi; Naruoka, Takehiko; Nakagawa, Hisashi; Miyata, Hiromu; Shiratani, Motohiro; Hori, Masafumi; Dei, Satoshi; Ayothi, Ramakrishnan; Hishiro, Yoshi; Nagai, Tomoki

2017-04-01

Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing. We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

EUVE and IR observations of the Polars HU Aqr and AR UMa

NASA Astrophysics Data System (ADS)

Howell, S.; Ciardi, D.

1999-12-01

Simultaneous EUVE and ground-based near-infrared J and K observations of the magnetic CV HU Aqr were performed. The observations occurred during a super-high state never before observed in HU Aqr. The average EUVE count-rate was 30-60 times higher than had been measured previously, allowing us to present the first ever EUV spectra of HU Aqr. The near-infrared observations show a corresponding flux increase of 2-3 times over previous J and K observations. However, the near-infrared eclipse minimum during this super-high state are the same as seen in previous observations, indicating that the eclipse in the near-infrared is total. We present a detailed comparison of the EUV and near-infrared emission of HU Aqr as a function of orbital phase and discuss the geometry and physical properties of the high energy and infrared emitting regions. AR UMa is the brightest EUV source yet observed with the EUVE satellite and is also the polar with the largest magnetic field, 250 MG. EUVE observations of the polar AR UMa have allowed, for the first time, EUV time-resolved spectral analysis and radial velocity measurements. We present EUV phase-resolved photometry and spectroscopy and show that the He 304 emission line is not produced on the heated face of the secondary star, but emanates from the inner illuminated regions of the coupling region and accretion stream. We comment on the overall structure of the accretion geometry as well. The authors acknowledge partial support of the research by NASA cooperative agreement NCC5-138 via an EUVE guest Observer mini-grant.

GOES-R SUVI EUV Flatfields Generated Using Boustrophedon Scans

NASA Astrophysics Data System (ADS)

Shing, L.; Edwards, C.; Mathur, D.; Vasudevan, G.; Shaw, M.; Nwachuku, C.

2017-12-01

The Solar Ultraviolet Imager (SUVI) is mounted on the Solar Pointing Platform (SPP) of the Geostationary Operational Environmental Satellite, GOES-R. SUVI is a Generalized Cassegrain telescope with a large field of view that employs multilayer coatings optimized to operate in six extreme ultraviolet (EUV) narrow bandpasses centered at 9.4, 13.1, 17.1, 19.5, 28.4 and 30.4 nm. The SUVI CCD flatfield response was determined using two different techniques; The Kuhn-Lin-Lorentz (KLL) Raster and a new technique called, Dynamic Boustrophedon Scans. The new technique requires less time to collect the data and is also less sensitive to Solar features compared with the KLL method. This paper presents the flatfield results of the SUVI using this technique during Post Launch Testing (PLT).

Expected scientific performance of the three spectrometers on the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Vallerga, J. V.; Jelinsky, P.; Vedder, P. W.; Malina, R. F.

1990-01-01

The expected in-orbit performance of the three spectrometers included on the Extreme Ultraviolet Explorer astronomical satellite is presented. Recent calibrations of the gratings, mirrors and detectors using monochromatic and continuum EUV light sources allow the calculation of the spectral resolution and throughput of the instrument. An effective area range of 0.2 to 2.8 sq cm is achieved over the wavelength range 70-600 A with a peak spectral resolution (FWHM) of 360 assuming a spacecraft pointing knowledge of 10 arc seconds (FWHM). For a 40,000 sec observation, the average 3 sigma sensitivity to a monochromatic line source is 0.003 photons/sq cm s. Simulated observations of known classes of EUV sources, such as hot white dwarfs, and cataclysmic variables are also presented.

Pulsar and CV Observations

NASA Astrophysics Data System (ADS)

Malina, R. F.

PSR_0656+14: Measurement of surface thermal emission from neutron stars (NS) is essential to theories regarding the condensed matter state equation, the thermal evolution of NS, and of NS atmospheres. We propose to conduct 50 Ang band FUV photometric observations of PSR B0656+14, an X-ray, SXR and EUV bright isolated NS with an optical counterpart. FUV photometry will provide critical characterization of the NS's surface thermal radiation. Higher energy observations may be effected by poorly established effects including magnetized atmospheres, chemical compositions, temperature gradients and gravitational effects. Optical observations may be subject to non-thermal effects. V3885 Sgr: V3885 Sgr is one of the brightest nonmagnetic cataclysmic variables. We propose to observe V3885 Sgr for 5 to 6 contiguous FUSE orbits, achieving a S/N of about 12 at full resolution even at the troughs of the source's O VI absorption lines in each spectrum (assuming 2000 sec visibility per orbit). The primary purpose of the observations is to use the source as a bright continuum against which to study local interstellar absorption lines. Although observed on Malina's Co-I Program, the data will be analyzed in collaboration with members of the O VI Project.

Universal EUV in-band intensity detector

DOEpatents

Berger, Kurt W.

2004-08-24

Extreme ultraviolet light is detected using a universal in-band detector for detecting extreme ultraviolet radiation that includes: (a) an EUV sensitive photodiode having a diode active area that generates a current responsive to EUV radiation; (b) one or more mirrors that reflects EUV radiation having a defined wavelength(s) to the diode active area; and (c) a mask defining a pinhole that is positioned above the diode active area, wherein EUV radiation passing through the pinhole is restricted substantially to illuminating the diode active area.

The extreme ultraviolet explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.

1988-01-01

The science design goals and engineering implementation for the Extreme Ultraviolet Explorer (EUVE) science payload are discussed. The primary scientific goal of the EUVE payload is to carry out an all-sky survey in the 100- to 900-A band of the spectrum. Another goal of the mission is to demonstrate the use of a scientific platform in near-earth orbit. EUVE data will be used to study the distribution of EUV stars in the neighborhood of the sun and the emission physics responsible for the EUV mission.

Observational Analysis of Coronal Fans

NASA Technical Reports Server (NTRS)

Talpeanu, D.-C.; Rachmeler, L; Mierla, Marilena

2017-01-01

Coronal fans (see Figure 1) are bright observational structures that extend to large distances above the solar surface and can easily be seen in EUV (174 angstrom) above the limb. They have a very long lifetime and can live up to several Carrington rotations (CR), remaining relatively stationary for many months. Note that they are not off-limb manifestation of similarly-named active region fans. The solar conditions required to create coronal fans are not well understood. The goal of this research was to find as many associations as possible of coronal fans with other solar features and to gain a better understanding of these structures. Therefore, we analyzed many fans and created an overview of their properties. We present the results of this statistical analysis and also a case study on the longest living fan.

Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging

DOE Office of Scientific and Technical Information (OSTI.GOV)

Green, Tyler; Kuznetsov, Ilya; Willingham, David

The purpose of this research was to characterize Extreme Ultraviolet Time-of-Flight (EUV TOF) Laser Ablation Mass Spectrometry for high spatial resolution elemental and isotopic analysis. We compare EUV TOF results with Secondary Ionization Mass Spectrometry (SIMS) to orient the EUV TOF method within the overall field of analytical mass spectrometry. Using the well-characterized NIST 61x glasses, we show that the EUV ionization approach produces relatively few molecular ion interferences in comparison to TOF SIMS. We demonstrate that the ratio of element ion to element oxide ion is adjustable with EUV laser pulse energy and that the EUV TOF instrument hasmore » a sample utilization efficiency of 0.014%. The EUV TOF system also achieves a lateral resolution of 80 nm and we demonstrate this lateral resolution with isotopic imaging of closely spaced particles or uranium isotopic standard materials.« less

Ephemeral active regions and coronal bright points: A solar maximum Mission 2 guest investigator study

NASA Technical Reports Server (NTRS)

Harvey, K. L.; Tang, F. Y. C.; Gaizauskas, V.; Poland, A. I.

1986-01-01

A dominate association of coronal bright points (as seen in He wavelength 10830) was confirmed with the approach and subsequent disappearance of opposite polarity magnetic network. While coronal bright points do occur with ephemeral regions, this association is a factor of 2 to 4 less than with sites of disappearing magnetic flux. The intensity variations seen in He I wavelength 10830 are intermittent and often rapid, varying over the 3 minute time resolution of the data; their bright point counterparts in the C IV wavelength 1548 and 20 cm wavelength show similar, though not always coincident time variations. Ejecta are associated with about 1/3 of the dark points and are evident in the C IV and H alpha data. These results support the idea that the anti-correlation of X-ray bright points with the solar cycle can be explained by the correlation of these coronal emission structures with sites of cancelling flux, indicating that, in some cases, the process of magnetic flux removal results in the release of energy. That the intensity variations are rapid and variable suggests that this process works intermittently.

Particle protection capability of SEMI-compliant EUV-pod carriers

NASA Astrophysics Data System (ADS)

Huang, George; He, Long; Lystad, John; Kielbaso, Tom; Montgomery, Cecilia; Goodwin, Frank

2010-04-01

With the projected rollout of pre-production extreme ultraviolet lithography (EUVL) scanners in 2010, EUVL pilot line production will become a reality in wafer fabrication companies. Among EUVL infrastructure items that must be ready, EUV mask carriers remain critical. To keep non-pellicle EUV masks free from particle contamination, an EUV pod concept has been extensively studied. Early prototypes demonstrated nearly particle-free results at a 53 nm PSL equivalent inspection sensitivity during EUVL mask robotic handling, shipment, vacuum pump-purge, and storage. After the passage of SEMI E152, which specifies the EUV pod mechanical interfaces, standards-compliant EUV pod prototypes, including a production version inner pod and prototype outer pod, were built and tested. Their particle protection capability results are reported in this paper. A state-of-the-art blank defect inspection tool was used to quantify their defect protection capability during mask robotic handling, shipment, and storage tests. To ensure the availability of an EUV pod for 2010 pilot production, the progress and preliminary test results of pre-production EUV outer pods are reported as well.

Objective for EUV microscopy, EUV lithography, and x-ray imaging

DOEpatents

Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

2016-05-03

Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

Initial results from the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1993-01-01

Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

Surface roughness control by extreme ultraviolet (EUV) radiation

NASA Astrophysics Data System (ADS)

Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

2017-10-01

Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

EUV mask pilot line at Intel Corporation

NASA Astrophysics Data System (ADS)

Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

2004-12-01

The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

Temporal variations of solar EUV, UV, and 10,830-A radiations

NASA Technical Reports Server (NTRS)

Donnelly, R. F.; Hinteregger, H. E.; Heath, D. F.

1986-01-01

The temporal characteristics of the full-disk chromospheric EUV fluxes agree well with those of the ground-based measurements of the chromospheric He I absorption line at 10,830 A and differ systematically from those of the coronal EUV and 10.7-cm flux. The ratio of the flux increase during the rise of solar cycle 21 to that during solar rotation variations is uniformly high for the chromospheric EUV and corroborating 10,830-A fluxes, highest for the transition region and 'cool' coronal EUV fluxes (T less than 2 x 10 to the 6th K), and lowest for the 'hot' coronal EUV and 10.7-cm flux. The rise and decay rates of episodes of major activity progress from those for the hot coronal EUV lines and the 10.7-cm flux to slower values for the chromospheric H Lyman alpha line, 10,830-A line, and photospheric 2050-A UV flux. It is suggested that active region remnants contribute significantly to the solar cycle increase and during the decay of episodes of major activity. The ratio of power in 13-day periodicity to that for 27 days in high (1/3) for the photospheric UV flux, medium (1/6) for the chromospheric EUV and 10,830-A fluxes, and small to negligible for the hot coronal EUV fluxes. These ratios are used to estimate the dependence of active region emission on the solar central meridian distance for chromospheric and coronal EUV flux.

Fundamentals of EUV resist-inorganic hardmask interactions

NASA Astrophysics Data System (ADS)

Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

2017-03-01

High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (<5nm) inorganic HMs can provide higher etch selectivity, lower post-etch LWR, decreased defectivity and wet strippability compared to spin-on hybrid HMs (e.g., SiARC), however such novel layers can induce resist adhesion failure and resist residue. Therefore, a fundamental understanding of EUV resist-inorganic HM interactions is needed in order to optimize the EUV resist interfacial behavior. In this paper, novel materials and processing techniques are introduced to characterize and improve the EUV resist-inorganic HM interface. HM surface interactions with specific EUV resist components are evaluated for open-source experimental resist formulations dissected into its individual additives using EUV contrast curves as an effective characterization method to determine post-development residue formation. Separately, an alternative adhesion promoter platform specifically tailored for a selected ultrathin inorganic HM based on amorphous silicon (aSi) is presented and the mitigation of resist delamination is exemplified for the cases of positive-tone and negative-tone development (PTD, NTD). Additionally, original wafer priming hardware for the deposition of such novel adhesion promoters is unveiled. The lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

Extreme ultraviolet (EUV) solar spectral irradiance (SSI) for ionospheric application - history and contemporary state-of-art

NASA Astrophysics Data System (ADS)

Schmidtke, G.; Jacobi, Ch.; Nikutowski, B.; Erhardt, Ch.

2014-11-01

After a historical survey of space related EUV measurements in Germany and the role of Karl Rawer in pursuing this work, we describe present developments in EUV spectroscopy and provide a brief outlook on future activities. The group of Karl Rawer has performed the first scientific space project in Western Europe on 19th October 1954. Then it was decided to include the field of solar EUV spectroscopy in ionospheric investigations. Starting in 1957 an intensified development of instrumentation was going on to explore solar EUV radiation, atmospheric airglow and auroral emissions until the institute had to stop space activities in the early nineteen-eighties. EUV spectroscopy was continued outside of the institute during eight years. This area of work was supported again by the institute developing the Auto-Calibrating Spectrometers (SolACES) for a mission on the International Space Station (ISS). After more than six years in space the instrument is still in operation. Meanwhile the work on the primary task also to validate EUV data available from other space missions has made good progress. The first results of validating those data and combine them into one set of EUV solar spectral irradiance are very promising. It will be recommended for using it by the science and application community. Moreover, a new low-cost type of an EUV spectrometer is presented for monitoring the solar EUV radiation. It shall be further developed for providing EUV-TEC data to be applied in ionospheric models replacing the Covington index F10.7. Applying these data for example in the GNSS signal evaluation a more accurate determination of GNSS receiver positions is expected for correcting the propagation delays of navigation signals traveling through the ionosphere from space to earth. - Latest results in the field of solar EUV spectroscopy are discussed, too.

Studies of the extreme ultraviolet/soft x-ray background

DOE Office of Scientific and Technical Information (OSTI.GOV)

Stern, R.A.

1978-01-01

The results of an extensive sky survey of the extreme ultraviolet (EUV)/soft x-ray background are reported. The data were obtained with a focusing telescope designed and calibrated at U.C. Berkeley which observed EUV sources and the diffuse background as part of the Apollo-Soyuz mission in July, 1975. With a primary field-of-view of 2.3 + 0.1/sup 0/ FWHM and four EUV bandpass filters (16 to 25, 20 to 73, 80 to 108, and 80 to 250 eV) the EUV telescope obtained background data included in the final observational sample for 21 discrete sky locations and 11 large angular scans, as wellmore » as for a number of shorter observations. Analysis of the data reveals as intense flux above 80 eV energy, with upper limits to the background intensity given for the lower energy filters Ca 2 x 10/sup 4/ and 6 x 10/sup 2/ ph cm/sup -2/ sec/sup -1/ ster/sup -1/ eV/sup -1/ at 21 and 45 eV respectively). The 80 to 108 eV flux agrees within statistical errors with the earlier results of Cash, Malina and Stern (1976): the Apollo-Soyuz average reported intensity is 4.0 +- 1.3 ph cm/sup -2/ sec/sup -1/ ster/sup -1/ eV/sup -1/ at Ca 100 eV, or roughly a factor of ten higher than the corresponding 250 eV intensity. The uniformity of the background flux is uncertain due to limitations in the statistical accuracy of the data; upper limits to the point-to-point standard deviation of the background intensity are (..delta..I/I approximately less than 0.8 +- 0.4 (80 to 108 eV) and approximately less than 0.4 +- 0.2 (80 to 250 eV). No evidence is found for a correlation between the telescope count rate and earth-based parameters (zenith angle, sun angle, etc.) for E approximately greater than 80 eV (the lower energy bandpasses are significantly affected by scattered solar radiation. Unlike some previous claims for the soft x-ray background, no simple dependence upon galactic latitude is seen.« less

Evidence for Precursors of the Coronal Hole Jets in Solar Bright Points

NASA Astrophysics Data System (ADS)

Bagashvili, Salome R.; Shergelashvili, Bidzina M.; Japaridze, Darejan R.; Kukhianidze, Vasil; Poedts, Stefaan; Zaqarashvili, Teimuraz V.; Khodachenko, Maxim L.; De Causmaecker, Patrick

2018-03-01

A set of 23 observations of coronal jet events that occurred in coronal bright points has been analyzed. The focus was on the temporal evolution of the mean brightness before and during coronal jet events. In the absolute majority of the cases either single or recurrent coronal jets (CJs) were preceded by slight precursor disturbances observed in the mean intensity curves. The key conclusion is that we were able to detect quasi-periodical oscillations with characteristic periods from sub-minute up to 3–4 minute values in the bright point brightness that precedes the jets. Our basic claim is that along with the conventionally accepted scenario of bright-point evolution through new magnetic flux emergence and its reconnection with the initial structure of the bright point and the coronal hole, certain magnetohydrodynamic (MHD) oscillatory and wavelike motions can be excited and these can take an important place in the observed dynamics. These quasi-oscillatory phenomena might play the role of links between different epochs of the coronal jet ignition and evolution. They can be an indication of the MHD wave excitation processes due to the system entropy variations, density variations, or shear flows. It is very likely a sharp outflow velocity transverse gradients at the edges between the open and closed field line regions. We suppose that magnetic reconnections can be the source of MHD waves due to impulsive generation or rapid temperature variations, and shear flow driven nonmodel MHD wave evolution (self-heating and/or overreflection mechanisms).

Development of a EUV Test Facility at the Marshall Space Flight Center

NASA Technical Reports Server (NTRS)

West, Edward; Pavelitz, Steve; Kobayashi, Ken; Robinson, Brian; Cirtain, Johnathan; Gaskin, Jessica; Winebarger, Amy

2011-01-01

This paper will describe a new EUV test facility that is being developed at the Marshall Space Flight Center (MSFC) to test EUV telescopes. Two flight programs, HiC - high resolution coronal imager (sounding rocket) and SUVI - Solar Ultraviolet Imager (GOES-R), set the requirements for this new facility. This paper will discuss those requirements, the EUV source characteristics, the wavelength resolution that is expected and the vacuum chambers (Stray Light Facility, Xray Calibration Facility and the EUV test chamber) where this facility will be used.

Design and progress in the fabrication of an EUV micro exposure tool optics for PREUVE

NASA Astrophysics Data System (ADS)

Geyl, Roland; Tanne, Jean-Francois

2001-12-01

SAGEM, through its REOSC product line, is participating since November 1999 to PREUVE, the French EUV initiative, and work within this program especially in the field of EUV illumination and projection optics. After a short description of the PREUVE main lines of activity, we will detail our contributions to this program and work progress. This is mainly focused on basic EUV optics fabrication technology in order to ensure the fabrication of the entire optics assembly of an EUV micro exposure tool.

UVSTAR: An imaging spectrograph with telescope for the Shuttle Hitchhiker-M platform

NASA Technical Reports Server (NTRS)

Stalio, Roberto; Sandel, Bill R.; Broadfoot, A. Lyle

1993-01-01

UVSTAR is an EUV spectral imager intended as a facility instrument devoted to solar system and astronomy studies. It covers the wavelength range of 500 to 1250 A, with sufficient spectral resolution to separate emission lines and to form spectrally resolved images of extended plasma sources. Targets include the Io plasma torus at Jupiter, hot stars, planetary nebulae and bright galaxies. UVSTAR consists of a pair of telescopes and concave grating spectrographs that cover the overlapping spectral ranges of 500-900 and 850-1250 A. The telescopes use two 30 cm diameter off-axis paraboloids having focal length of 1.5 m. An image of the target is formed at the entrance slits of the two concave grating spectrographs. The gratings provide dispersion and re-image the slits at the detectors, intensified CCD's. The readout format of the detectors can be chosen by computer, and three slit widths are selectable to adapt the instrument to specific tasks. UVSTAR has internal gimbals which allow rotation of plus or minus 3 deg about each of two axes. Dedicated finding and tracking telescopes will acquire and track the target after rough pointing is achieved by orienting the Orbiter. Responsibilities for implementation and utilization of UVSTAR are shared by groups in Italy and the U.S. UVSTAR is scheduled for flight in early 1995, timed for an opportunity to observe the Jovian system.

Flare Seismology from SDO Observations

NASA Astrophysics Data System (ADS)

Lindsey, Charles; Martinez Oliveros, Juan Carlos; Hudson, Hugh

2011-10-01

Some flares release intense seismic transients into the solar interior. These transients are the sole instance we know of in which the Sun's corona exerts a conspicuous influence on the solar interior through flares. The desire to understand this phenomenon has led to ambitious efforts to model the mechanisms by which energy stored in coronal magnetic fields drives acoustic waves that penetrate deep into the Sun's interior. These mechanisms potentially involve the hydrodynamic response of the chromosphere to thick-target heating by high-energy particles, radiative exchange in the chromosphere and photosphere, and Lorentz-force transients to account for acoustic energies estimated up to at 5X10^27 erg and momenta of order 6X10^19 dyne sec. An understanding of these components of flare mechanics promises more than a powerful diagnostic for local helioseismology. It could give us fundamental new insight into flare mechanics themselves. The key is appropriate observations to match the models. Helioseismic observations have identified the compact sources of transient seismic emission at the foot points of flares. The Solar Dynamics Observatory is now giving us high quality continuum-brightness and Doppler observations of acoustically active flares from HMI concurrent with high-resolution EUV observations from AIA. Supported by HXR observations from RHESSI and a broad variety of other observational resources, the SDO promises a leading role in flare research in solar cycle 24.

Stereoscopy and Tomography of Coronal Structures

NASA Astrophysics Data System (ADS)

de Patoul, J.

2012-04-01

The hot solar corona consists of a low density plasma, which is highly structured by the magnetic field. To resolve and study the corona, several solar Ultraviolet (UV) and X-ray telescopes are operated with high spatial and temporal resolution. EUV (Extreme UV) image sequences of the lower solar corona have revealed a wide variety of structures with sizes ranging from the Sun's diameter to the limit of the angular resolution. Active regions can be observed with enhanced temperature and density, as well as 'quiet' regions, coronal holes with lower density and numerous other transient phenomena such as plumes, jets, bright points, flares, filaments, coronal mass ejections, all structured by the coronal magnetic field. In this work, we analyze polar plumes in a sequence of Solar EUV images taken nearly simultaneously by the three telescopes on board of the spacecraft STEREO/SECCHI A and B, and SOHO/EIT. Plumes appear in EUV images as elongated objects starting on the surface of the Sun extending super-radially into the corona. Their formation and contribution to the fast solar wind and other coronal phenomena are still under debate. Knowledge of the polar plume 3-D geometry can help to understand some of the physical processes in the solar corona. In this dissertation we develop new techniques for the characterization of polar plume structures in solar coronal images (Part II) then we analyze these structures using the techniques (Part III): We design a new technique capable of automatically identifying plumes in solar EUV images close to the limb at 1.01-1.39 Ro. This plume identification is based on a multi-scale Hough-wavelet analysis. We show that the method is well adapted to identifying the location, width and orientation of plumes. Starting from Hough-wavelet analysis, we elaborate on two other techniques to determine 3-D plume localization and structure: (i) tomography employing data from a single spacecraft over more than half a rotation and (ii) stereoscopy from simultaneous data observed by two or more spacecrafts. For tomography, we consider the filtered back projection method for which we incorporate the differential rotation of the Sun. For stereoscopy, we use three view directions for a conventional stereoscopic triangulation. These multi-scale Hough-wavelet analyses, stereoscopy and tomography extensions have been applied for the first time in a coronal plumes study. The temporal evolution of the mean orientation of plumes from May 2007 to April 2008 is then analyzed and discussed. Since the plume orientation is assumed to follow the coronal magnetic field, this analysis reveals: (i) a mean orientation of plumes more horizontal than for a dipole magnetic field, (ii) an asymmetry of the coronal open polar cap magnetic field from the solar rotation axis by up to 6° and (iii) a variation of these orientation and asymmetry over the year. Finally, with the help of the reconstructed 3-D geometry of the plumes, we study in detail their temporal evolution as well as the shape and size of their cross sections. The study reveals: (i) different lifetimes of plumes from 2-3 days up to 9 days and (ii) the presence of both near-circular plume cross sections and plumes with curtain-like structures. Also discussed is the plumes positions and their relation to other coronal phenomena such as coronal holes and jets. Plumes are found to be located inside coronal holes, and jets could explain the intensity enhancement within the plumes.

Status of EUVL mask development in Europe (Invited Paper)

NASA Astrophysics Data System (ADS)

Peters, Jan H.

2005-06-01

EUV lithography is the prime candidate for the next generation lithography technology after 193 nm immersion lithography. The commercial onset for this technology is expected for the 45 nm half-pitch technology or below. Several European and national projects and quite a large number of companies and research institutions in Europe work on various aspects of the technological challenges to make EUV a commercially viable technology in the not so far future. Here the development of EUV sources, the development of an EUV exposure tools, metrology tools dedicated for characterization of mask, the production of EUV mask blanks and the mask structuring itself are the key areas in which major activities can be found. In this talk we will primarily focus on those activities, which are related to establish an EUV mask supply chain with all its ingredients from substrate production, polishing, deposition of EUV layers, blank characterization, mask patterning process and the consecutive metrology and defect inspection as well as shipping and handling from blank supply to usage in the wafer fab. The EUV mask related projects on the national level are primarily supported by the French Ministry of Economics and Finance (MinEFi) and the German Ministry of Education and Research (BMBF).

EUV laser produced and induced plasmas for nanolithography

NASA Astrophysics Data System (ADS)

Sizyuk, Tatyana; Hassanein, Ahmed

2017-10-01

EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

Extreme ultraviolet spectroscopy diagnostics of low-temperature plasmas based on a sliced multilayer grating and glass capillary optics.

PubMed

Kantsyrev, V L; Safronova, A S; Williamson, K M; Wilcox, P; Ouart, N D; Yilmaz, M F; Struve, K W; Voronov, D L; Feshchenko, R M; Artyukov, I A; Vinogradov, A V

2008-10-01

New extreme ultraviolet (EUV) spectroscopic diagnostics of relatively low-temperature plasmas based on the application of an EUV spectrometer and fast EUV diodes combined with glass capillary optics is described. An advanced high resolution dispersive element sliced multilayer grating was used in the compact EUV spectrometer. For monitoring of the time history of radiation, filtered fast EUV diodes were used in the same spectral region (>13 nm) as the EUV spectrometer. The radiation from the plasma was captured by using a single inexpensive glass capillary that was transported onto the spectrometer entrance slit and EUV diode. The use of glass capillary optics allowed placement of the spectrometer and diodes behind the thick radiation shield outside the direction of a possible hard x-ray radiation beam and debris from the plasma source. The results of the testing and application of this diagnostic for a compact laser plasma source are presented. Examples of modeling with parameters of plasmas are discussed.

Mechanisms of EUV exposure: electrons and holes

NASA Astrophysics Data System (ADS)

Narasimhan, Amrit; Grzeskowiak, Steven; Ackerman, Christian; Flynn, Tracy; Denbeaux, Greg; Brainard, Robert L.

2017-03-01

In extreme ultraviolet (EUV) lithography, 92 eV photons are used to expose photoresists. Current EUV photoresists are composed of photoacid generators (PAGs) in polymer matrices. Secondary electrons (2 - 80 eV) created in resists during EUV exposure play large role in acid-production. There are several proposed mechanisms for electron-resist interactions: internal excitation, electron trapping, and hole-initiated chemistry. Here, we will address two central questions in EUV resist research: (1) How many electrons are generated per EUV photon absorption? (2) By which mechanisms do these electrons interact and react with molecules in the resist? We will use this framework to evaluate the contributions of electron trapping and hole initiated chemistry to acid production in chemically amplified photoresists, with specific emphasis on the interdependence of these mechanisms. We will show measurements of acid yield from direct bulk electrolysis of PAGs and EUV exposures of PAGs in phenolic and nonphenolic polymers to narrow down the mechanistic possibilities in chemically amplified resists.

Solar EUV irradiance for space weather applications

NASA Astrophysics Data System (ADS)

Viereck, R. A.

2015-12-01

Solar EUV irradiance is an important driver of space weather models. Large changes in EUV and x-ray irradiances create large variability in the ionosphere and thermosphere. Proxies such as the F10.7 cm radio flux, have provided reasonable estimates of the EUV flux but as the space weather models become more accurate and the demands of the customers become more stringent, proxies are no longer adequate. Furthermore, proxies are often provided only on a daily basis and shorter time scales are becoming important. Also, there is a growing need for multi-day forecasts of solar EUV irradiance to drive space weather forecast models. In this presentation we will describe the needs and requirements for solar EUV irradiance information from the space weather modeler's perspective. We will then translate these requirements into solar observational requirements such as spectral resolution and irradiance accuracy. We will also describe the activities at NOAA to provide long-term solar EUV irradiance observations and derived products that are needed for real-time space weather modeling.

First environmental data from the EUV engineering test stand

NASA Astrophysics Data System (ADS)

Klebanoff, Leonard E.; Malinowski, Michael E.; Grunow, Philip A.; Clift, W. Miles; Steinhaus, Chip; Leung, Alvin H.; Haney, Steven J.

2001-08-01

The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible design of the ETS, careful cleaning of parts and pre-baking of cables and sub assemblies where possible, and clean assembly procedures. As a result of the hydrocarbon control, the residual ETS vacuum environment is rich in water vapor. Analysis of witness plate data indicates that the ETS environment does not pose a contamination risk to the optics in the absence of EUV irradiation. However, with EUV exposure, the water rich environment can lead to EUV- induced water oxidation of the Si-terminated Mo/Si optics. Added ethanol can prevent optic oxidation, allowing carbon growth via EUV cracking of low-level residual hydrocarbons to occur. The EUV environmental issues are understood, mitigation approaches have been validated, and EUV optic contamination appears to be manageable.

Design and pitch scaling for affordable node transition and EUV insertion scenario

NASA Astrophysics Data System (ADS)

Kim, Ryoung-han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Larivière, Stephane; McIntyre, Greg

2017-04-01

imec's DTCO and EUV achievement toward imec 7nm (iN7) technology node which is industry 5nm node equivalent is reported with a focus on cost and scaling. Patterning-aware design methodology supports both iArF multiple patterning and EUV under one compliant design rule. FinFET device with contacted poly pitch of 42nm and metal pitch of 32nm with 7.5-track, 6.5-track, and 6-track standard cell library are explored. Scaling boosters are used to provide additional scaling and die cost benefit while lessening pitch shrink burden, and it makes EUV insertion more affordable. EUV pattern fidelity is optimized through OPC, SMO, M3D, mask sizing and SRAF. Processed wafers were characterized and edge-placement-error (EPE) variability is validated for EUV insertion. Scale-ability and cost of ownership of EUV patterning in aligned with iN7 standard cell design, integration and patterning specification are discussed.

Methods and apparatuses for detection of radiation with semiconductor image sensors

DOEpatents

Cogliati, Joshua Joseph

2018-04-10

A semiconductor image sensor is repeatedly exposed to high-energy photons while a visible light obstructer is in place to block visible light from impinging on the sensor to generate a set of images from the exposures. A composite image is generated from the set of images with common noise substantially removed so the composite image includes image information corresponding to radiated pixels that absorbed at least some energy from the high-energy photons. The composite image is processed to determine a set of bright points in the composite image, each bright point being above a first threshold. The set of bright points is processed to identify lines with two or more bright points that include pixels therebetween that are above a second threshold and identify a presence of the high-energy particles responsive to a number of lines.

CXRO - Mi-Young Im, Staff Scientist

Science.gov Websites

X-Ray Database Zone Plate Education Nanomagnetism X-Ray Microscopy LDJIM EUV Lithography EUV Mask Publications Contact The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley -Ray Optics X-Ray Database Nanomagnetism X-Ray Microscopy EUV Lithography EUV Mask Imaging

Discovery of Strong EUV-induced Balmer Emission in the New WD+dM Binary EUVE J2013+40.0 (RE 2013+400)

NASA Astrophysics Data System (ADS)

Thorstensen, J. R.; Vennes, S.

1993-12-01

The binary system EUVE J2013+40.0 (= RE 2013+400) was discovered in the EUV-selected sample of white dwarfs identified in the course of the ROSAT Wide Field Camera (WFC) all-sky survey (Pounds et al. 1993, MNRAS, 260, 77). The intense extreme ultraviolet (EUV) emission from the hot white dwarf (DAO type) was also detected in the course of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (Bowyer et al. 1993, ApJ, submitted), and the subsequent optical identification campaign suggested the association of EUVE J2013+40.0 with the Feige 24 class of binary systems (see Vennes & Thorstensen, these proceedings). Such systems consist of a hot H-rich white dwarf (DA/DAO) and a red dwarf companion (dM) and are characterized by strong, narrow, variable Balmer emission. We obtained spectroscopy with 4 Angstroms resolution at the Michigan-Dartmouth-MIT Hiltner 2.4 m, covering the Hα and Hβ range. The Hα emission line velocity and equivalent widths varied with a period of 0.708 +/- 0.003 d; the velocity semiamplitude is 89 +/- 3 km s(-1) . The emission equivalent width reaches maximum strength 0.251 +/- 0.007 cycle after maximum emission-line velocity, that is, when the emission source reaches superior conjunction. This is just as expected if the emission arises from reprocessing of the EUV radiation incident upon the face of the dM star facing the white dwarf, as proposed for Feige 24 by Thorstensen et al. (1978, ApJ, 223, 260). EUVE J2013+40.0 is one of a handful of WD+dM binary systems in which the illumination effect is observed with unambiguous clarity. By comparing Feige 24 and EUVE J2013+40.0, and modelling the white dwarf EUV emission and red dwarf Balmer emission, we constrain the orbital inclinations. Additional spectroscopy of EUVE J2013+40.0 is being scheduled to determine the component masses. These are important input data for the study of the close binary systems which arise from common envelope evolution. This work is supported by a forthcoming NASA Guest Observer grant.

EUV mask manufacturing readiness in the merchant mask industry

NASA Astrophysics Data System (ADS)

Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

2017-10-01

As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for the broadest community possible as the technology is implemented first within and then beyond the initial early adopters.

From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Fallica, Roberto; Fan, Daniel; Karim, Waiz; Vockenhuber, Michaela; van Bokhoven, Jeroen A.; Ekinci, Yasin

2016-09-01

Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic images to create highly ordered nanostructures that are difficult or time consuming to pattern by electron beam lithography (EBL) yet interesting for a wide range of applications such as catalysis, electronic and photonic devices, and fundamental materials analysis, among others. Here, we will show state-of the-art research performed using the EUV-IL tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). For example, using a grating period doubling method, a diffraction mask capable of patterning a world record in photolithography of 6 nm half-pitch (HP), was produced. In addition to the description of the method, we will give a few examples of applications of the technique. Well-ordered arrays of suspended silicon nanowires down to 6.5 nm linewidths have been fabricated and are to be studied as field effect transistors (FETs) or biosensors, for instance. EUV achromatic Talbot lithography (ATL), another interference scheme that utilizes a single grating, was shown to yield well-defined nanoparticles over large-areas with high uniformity presenting great opportunities in the field of nanocatalysis. EUV-IL is in addition, playing a key role in the future introduction of EUV lithography into high volume manufacturing (HVM) of semiconductor devices for the 7 and 5 nm logic node (16 nm and 13 nm HP, respectively) and beyond while the availability of commercial EUV-tools is still very much limited for research.

Quasi-periodic Radio Bursts Associated with Fast-mode Waves near a Magnetic Null Point

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk, E-mail: pankaj.kumar@nasa.gov

This paper presents an observation of quasi-periodic rapidly propagating waves observed in the Atmospheric Image Assembly (AIA) 171/193 Å channels during the impulsive phase of an M1.9 flare that occurred on 2012 May 7. The instant period was found to decrease from 240 to 120 s, and the speed of the wavefronts was in the range of ∼664–1416 km s{sup −1}. Almost simultaneously, quasi-periodic bursts with similar instant periods, ∼70 and ∼140 s, occur in the microwave emission and in decimetric type IV and type III radio bursts, and in the soft X-ray emission. The magnetic field configuration of themore » flare site was consistent with a breakout topology, i.e., a quadrupolar field along with a magnetic null point. The quasi-periodic rapidly propagating wavefronts of the EUV emission are interpreted as a fast magnetoacoustic wave train. The observations suggest that the fast-mode waves are generated during the quasi-periodic magnetic reconnection in the cusp region above the flare arcade loops. For the first time, we provide evidence of a tadpole wavelet signature at about 70–140 s in decimetric (245/610 MHz) radio bursts, along with the direct observation of a coronal fast-mode wave train in EUV. In addition, at AIA 131/193 Å we observed quasi-periodic EUV disturbances with periods of 95 and 240 s propagating downward at apparent speeds of 172–273 km s{sup −1}. The nature of these downward propagating disturbances is not revealed, but they could be connected to magnetoacoustic waves or periodically shrinking loops.« less

Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

NASA Astrophysics Data System (ADS)

Kyser, David F.; Eib, Nicholas K.; Ritchie, Nicholas W. M.

2016-07-01

The absorbed energy density (eV/cm3) deposited by extreme ultraviolet (EUV) photons and electron beam (EB) high-keV electrons is proposed as a metric for characterizing the sensitivity of EUV resist films. Simulations of energy deposition are used to calculate the energy density as a function of the incident aerial flux (EUV: mJ/cm2, EB: μC/cm2). Monte Carlo calculations for electron exposure are utilized, and a Lambert-Beer model for EUV absorption. The ratio of electron flux to photon flux which results in equivalent energy density is calculated for a typical organic chemically amplified resist film and a typical inorganic metal-oxide film. This ratio can be used to screen EUV resist materials with EB measurements and accelerate advances in EUV resist systems.

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

NASA Astrophysics Data System (ADS)

Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Larivière, Stéphane; Franke, Joern-Holger; Blanco Carballo, Victor M.; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, R. Ryoung-han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton

2017-03-01

The imec N7 (iN7) platform has been developed to evaluate EUV patterning of advanced logic BEOL layers. Its design is based on a 42 nm first-level metal (M1) pitch, and a 32 nm pitch for the subsequent M2 layer. With these pitches, the iN7 node is an `aggressive' full-scaled N7, corresponding to IDM N7, or foundry N5. Even in a 1D design style, single exposure of the 16 nm half-pitch M2 layer is very challenging for EUV lithography, because of its tight tip-to-tip configurations. Therefore, the industry is considering the hybrid use of ArFi-based SAQP combined with EUV Block as an alternative to EUV single exposure. As a consequence, the EUV Block layer may be one of the first layers to adopt EUV lithography in HVM. In this paper, we report on the imec iN7 SAQP + Block litho performance and process integration, targeting the M2 patterning for a 7.5 track logic design. The Block layer is exposed on an ASML NXE:3300 EUV-scanner at imec, using optimized illumination conditions and state-of-the-art metal-containing negative tone resist (Inpria). Subsequently, the SAQP and block structures are characterized in a morphological study, assessing pattern fidelity and CD/EPE variability. The work is an experimental feasibility study of EUV insertion, for SAQP + Block M2 patterning on an industry-relevant N5 use-case.

EUVS Sounding Rocket Payload

NASA Technical Reports Server (NTRS)

Stern, Alan S.

1996-01-01

During the first half of this year (CY 1996), the EUVS project began preparations of the EUVS payload for the upcoming NASA sounding rocket flight 36.148CL, slated for launch on July 26, 1996 to observe and record a high-resolution (approx. 2 A FWHM) EUV spectrum of the planet Venus. These preparations were designed to improve the spectral resolution and sensitivity performance of the EUVS payload as well as prepare the payload for this upcoming mission. The following is a list of the EUVS project activities that have taken place since the beginning of this CY: (1) Applied a fresh, new SiC optical coating to our existing 2400 groove/mm grating to boost its reflectivity; (2) modified the Ranicon science detector to boost its detective quantum efficiency with the addition of a repeller grid; (3) constructed a new entrance slit plane to achieve 2 A FWHM spectral resolution; (4) prepared and held the Payload Initiation Conference (PIC) with the assigned NASA support team from Wallops Island for the upcoming 36.148CL flight (PIC held on March 8, 1996; see Attachment A); (5) began wavelength calibration activities of EUVS in the laboratory; (6) made arrangements for travel to WSMR to begin integration activities in preparation for the July 1996 launch; (7) paper detailing our previous EUVS Venus mission (NASA flight 36.117CL) published in Icarus (see Attachment B); and (8) continued data analysis of the previous EUVS mission 36.137CL (Spica occultation flight).

A new Schwarzschild optical system for two-dimensional EUV imaging of MRX plasmas

NASA Astrophysics Data System (ADS)

Bolgert, P.; Bitter, M.; Efthimion, P.; Hill, K. W.; Ji, H.; Myers, C. E.; Yamada, M.; Yoo, J.; Zweben, S.

2013-10-01

This poster describes the design and construction of a new Schwarzschild optical system for two-dimensional EUV imaging of plasmas. This optical system consists of two concentric spherical mirrors with radii R1 and R2, and is designed to operate with certain angles of incidence θ1 and θ2. The special feature of this system resides in the fact that all the rays passing through the system are tangential to a third concentric circle; it assures that the condition for Bragg reflection is simultaneously fulfilled at each point on the two reflecting surfaces if the spherical mirrors are replaced by spherical multi-layer structures. A prototype of this imaging system will be implemented in the Magnetic Reconnection Experiment (MRX) at PPPL to obtain two-dimensional EUV images of the plasma in the energy range from 18 to 62 eV; the relative intensity of the emitted radiation in this energy range was determined from survey measurements with a photodiode. It is thought that the radiation at these energies is due to Bremsstrahlung and line emission caused by suprathermal electrons. This research is supported by DoE Contract Number DE-AC02-09CH11466 and by the Center for Magnetic Self-Organization (CMSO).

A small-scale eruption leading to a blowout macrospicule jet in an on-disk coronal hole

DOE Office of Scientific and Technical Information (OSTI.GOV)

Adams, Mitzi; Sterling, Alphonse C.; Moore, Ronald L.

2014-03-01

We examine the three-dimensional magnetic structure and dynamics of a solar EUV-macrospicule jet that occurred on 2011 February 27 in an on-disk coronal hole. The observations are from the Solar Dynamics Observatory (SDO) Atmospheric Imaging Assembly (AIA) and the SDO Helioseismic and Magnetic Imager (HMI). The observations reveal that in this event, closed-field-carrying cool absorbing plasma, as in an erupting mini-filament, erupted and opened, forming a blowout jet. Contrary to some jet models, there was no substantial recently emerged, closed, bipolar-magnetic field in the base of the jet. Instead, over several hours, flux convergence and cancellation at the polarity inversionmore » line inside an evolved arcade in the base apparently destabilized the entire arcade, including its cool-plasma-carrying core field, to undergo a blowout eruption in the manner of many standard-sized, arcade-blowout eruptions that produce a flare and coronal mass ejection. Internal reconnection made bright 'flare' loops over the polarity inversion line inside the blowing-out arcade field, and external reconnection of the blowing-out arcade field with an ambient open field made longer and dimmer EUV loops on the outside of the blowing-out arcade. That the loops made by the external reconnection were much larger than the loops made by the internal reconnection makes this event a new variety of blowout jet, a variety not recognized in previous observations and models of blowout jets.« less

A long-term optical and X-ray ephemeris of the polar EK Ursae Majoris

NASA Astrophysics Data System (ADS)

Beuermann, K.; Diese, J.; Paik, S.; Ploch, A.; Zachmann, J.; Schwope, A. D.; Hessman, F. V.

2009-11-01

Aims: We searched for long-term period changes in the polar EK UMa using new optical data and archival X-ray/EUV data. Methods: An optical ephemeris was derived from data taken remotely with the MONET/N telescope and compared with the X-ray ephemeris based on Einstein, ROSAT, and EUVE data. A three-parameter fit to the combined data sets yields the epoch, the period, and the phase offset between the optical minima and the X-ray absorption dips. An added quadratic term is insignificant and sets a limit to the period change. Results: The derived linear ephemeris is valid over 30 years and the common optical and X-ray period is P = 0.0795440225(24) days. There is no evidence of long-term O-C variations or a period change over the past 17 years (ΔP = -0.14 ± 0.50 ms). We suggest that the observed period is the orbital period and that the system is tightly synchronized. The limit on ΔP and the phase constancy of the bright part of the light curve indicate that O-C variations of the type seen in the polars DP Leo and HU Aqr or the pre-CV NN Ser do not seem to occur in EK UMa. The X-ray dips lag the optical minima by 9.5° ± 0.7° in azimuth, providing some insight into the accretion geometry.

Quantitative Examination of a Large Sample of Supra-Arcade Downflows in Eruptive Solar Flares

NASA Technical Reports Server (NTRS)

Savage, Sabrina L.; McKenzie, David E.

2011-01-01

Sunward-flowing voids above post-coronal mass ejection flare arcades were first discovered using the soft X-ray telescope aboard Yohkoh and have since been observed with TRACE (extreme ultraviolet (EUV)), SOHO/LASCO (white light), SOHO/SUMER (EUV spectra), and Hinode/XRT (soft X-rays). Supra-arcade downflow (SAD) observations suggest that they are the cross-sections of thin flux tubes retracting from a reconnection site high in the corona. Supra-arcade downflowing loops (SADLs) have also been observed under similar circumstances and are theorized to be SADs viewed from a perpendicular angle. Although previous studies have focused on dark flows because they are easier to detect and complementary spectral data analysis reveals their magnetic nature, the signal intensity of the flows actually ranges from dark to bright. This implies that newly reconnected coronal loops can contain a range of hot plasma density. Previous studies have presented detailed SAD observations for a small number of flares. In this paper, we present a substantial SADs and SADLs flare catalog. We have applied semiautomatic detection software to several of these events to detect and track individual downflows thereby providing statistically significant samples of parameters such as velocity, acceleration, area, magnetic flux, shrinkage energy, and reconnection rate. We discuss these measurements (particularly the unexpected result of the speeds being an order of magnitude slower than the assumed Alfven speed), how they were obtained, and potential impact on reconnection models.

Large-Scale Coronal Heating from "Cool" Activity in the Solar Magnetic Network

NASA Technical Reports Server (NTRS)

Falconer, D. A.; Moore, R. L.; Porter, J. G.; Hathaway, D. H.

1999-01-01

In Fe XII images from SOHO/EIT, the quiet solar corona shows structure on scales ranging from sub-supergranular (i.e., bright points and coronal network) to multi-supergranular (large-scale corona). In Falconer et al 1998 (Ap.J., 501, 386) we suppressed the large-scale background and found that the network-scale features are predominantly rooted in the magnetic network lanes at the boundaries of the supergranules. Taken together, the coronal network emission and bright point emission are only about 5% of the entire quiet solar coronal Fe XII emission. Here we investigate the relationship between the large-scale corona and the network as seen in three different EIT filters (He II, Fe IX-X, and Fe XII). Using the median-brightness contour, we divide the large-scale Fe XII corona into dim and bright halves, and find that the bright-half/dim half brightness ratio is about 1.5. We also find that the bright half relative to the dim half has 10 times greater total bright point Fe XII emission, 3 times greater Fe XII network emission, 2 times greater Fe IX-X network emission, 1.3 times greater He II network emission, and has 1.5 times more magnetic flux. Also, the cooler network (He II) radiates an order of magnitude more energy than the hotter coronal network (Fe IX-X, and Fe XII). From these results we infer that: 1) The heating of the network and the heating of the large-scale corona each increase roughly linearly with the underlying magnetic flux. 2) The production of network coronal bright points and heating of the coronal network each increase nonlinearly with the magnetic flux. 3) The heating of the large-scale corona is driven by widespread cooler network activity rather than by the exceptional network activity that produces the network coronal bright points and the coronal network. 4) The large-scale corona is heated by a nonthermal process since the driver of its heating is cooler than it is. This work was funded by the Solar Physics Branch of NASA's office of Space Science through the SR&T Program and the SEC Guest Investigator Program.

How active was solar cycle 22?

NASA Technical Reports Server (NTRS)

Hoegy, W. R.; Pesnell, W. D.; Woods, T. N.; Rottman, G. J.

1993-01-01

Solar EUV observations from the Langmuir probe on Pioneer Venus Orbiter suggest that at EUV wavelengths solar cycle 22 was more active than solar cycle 21. The Langmuir probe, acting as a photodiode, measured the integrated solar EUV flux over a 13 1/2 year period from January 1979 to June 1992, the longest continuous solar EUV measurement. The Ipe EUV flux correlated very well with the SME measurement of L-alpha during the lifetime of SME and with the UARS SOLSTICE L-alpha from October 1991 to June 1992 when the Ipe measurement ceased. Starting with the peak of solar cycle 21, there was good general agreement of Ipe EUV with the 10.7 cm, Ca K, and He 10830 solar indices, until the onset of solar cycle 22. From 1989 to the start of 1992, the 10.7 cm flux exhibited a broad maximum consisting of two peaks of nearly equal magnitude, whereas Ipe EUV exhibited a strong increase during this time period making the second peak significantly higher than the first. The only solar index that exhibits the same increase in solar activity as Ipe EUV and L-alpha during the cycle 22 peak is the total magnetic flux. The case for high activity during this peak is also supported by the presence of very high solar flare intensity.

Low temperature plasmas induced in SF6 by extreme ultraviolet (EUV) pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Skrzeczanowski, W.; Czwartos, J.; Kostecki, J.; Fiedorowicz, H.; Wachulak, P.; Fok, T.

2018-06-01

In this work, a comparative study of extreme ultraviolet (EUV) induced low temperature SF6-based plasmas, created using two different irradiation systems, was performed. Both systems utilized laser-produced plasma (LPP) EUV sources. The essential difference between the systems concerned the formation of the driving EUV beam. The first one contained an efficient ellipsoidal EUV collector allowing for focusing of the EUV radiation at a large distance from the LPP source. The spectrum of focused radiation was limited to the long-wavelength part of the total LPP emission, λ > 8 nm, due to the reflective properties of the collector. The second system did not contain any EUV collector. The gas to be ionized was injected in the vicinity of the LPP, at a distance of the order of 10 mm. In both systems, energies of the driving photons were high enough for dissociative ionization of the SF6 molecules and ionization of atoms or even singly charged ions. Plasmas, created due to these processes, were investigated by spectral measurements in the EUV, ultraviolet (UV), and visible (VIS) spectral ranges. These low temperature plasmas were employed for preliminary experiments concerning surface treatment. The formation of pronounced nanostructures on the silicon surface after plasma treatment was demonstrated.

Influence of cloud fraction and snow cover to the variation of surface UV radiation at King Sejong station, Antarctica

NASA Astrophysics Data System (ADS)

Lee, Yun Gon; Koo, Ja-Ho; Kim, Jhoon

2015-10-01

This study investigated how cloud fraction and snow cover affect the variation of surface ultraviolet (UV) radiation by using surface Erythemal UV (EUV) and Near UV (NUV) observed at the King Sejong Station, Antarctica. First the Radiative Amplification Factor (RAF), the relative change of surface EUV according to the total-column ozone amount, is compared for different cloud fractions and solar zenith angles (SZAs). Generally, all cloudy conditions show that the increase of RAF as SZA becomes larger, showing the larger effects of vertical columnar ozone. For given SZA cases, the EUV transmission through mean cloud layer gradually decreases as cloud fraction increases, but sometimes the maximum of surface EUV appears under partly cloudy conditions. The high surface EUV transmittance under broken cloud conditions seems due to the re-radiation of scattered EUV by cloud particles. NUV transmission through mean cloud layer also decreases as cloud amount increases but the sensitivity to the cloud fraction is larger than EUV. Both EUV and NUV radiations at the surface are also enhanced by the snow cover, and their enhancement becomes higher as SZA increases implying the diurnal variation of surface albedo. This effect of snow cover seems large under the overcast sky because of the stronger interaction between snow surface and cloudy sky.

Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-06-01

In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.

EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.

PubMed

Gaballah, A E H; Nicolosi, P; Ahmed, Nadeem; Jimenez, K; Pettinari, G; Gerardino, A; Zuppella, P

2018-01-01

The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

The O II /7320-7330 A/ airglow - A morphological study

NASA Technical Reports Server (NTRS)

Yee, J. H.; Abreu, V. J.; Hays, P. B.

1981-01-01

A statistical study of the 7320-30 A airglow arising from the metastable transition between aP and aD states of atomic oxygen ions was conducted by analyzing the data taken from the visible airglow experiment on the Atmosphere Explorer satellites C and E during the time periods between 1974 and 1979. Averaged column emission rate profiles as a function of solar zenith angle and solar activity variation are presented. The galactic background has been carefully subtracted. The result shows that the rate of decreasing emission as a function of solar zenith angle agrees with the theoretical calculation based upon a neutral atmosphere model and the solar spectrum as measured by the EUV spectrometer on the Atmosphere Explorer satellite. Furthermore, an expected increase with solar activity also appeared in a plot of emission brightness versus solar 10.7-cm flux.

Predicting the Structure of the Solar Corona for the Total Solar Eclipse of March 29,2006

NASA Technical Reports Server (NTRS)

Mikic, Z.; Linker, J. a.; Lionello, R.; Riley, P.; TItov, V.

2007-01-01

We describe the use of a three-dimensional MHD model to predict the s tructure of the corona prior to the total solar eclipse of March 29, 2006. The calculation uses the observed photospheric radial magnetic f ield as a boundary condition. We use a new version of our model that has an improved description of energy transport in the corona. The mo del allows us to predict the emission of X-ray and EUV radiation in t he corona. We compare the predicted polarization brightness in the co rona with four observations of the eclipse from Greece, Egypt, and Li bya, and we demonstrate that the model accurately predicts the largescale structure of the corona. We also compare X-ray emission from the model with GOES/SXI images.

On the Link between the Release of Solar Energetic Particles Measured at Widespread Heliolongitudes and the Properties of the Associated Coronal Shocks

NASA Astrophysics Data System (ADS)

Lario, D.; Kwon, R.-Y.; Riley, P.; Raouafi, N. E.

2017-10-01

Under the paradigm that the main agents in the acceleration of solar energetic particles (SEPs) are shocks initially driven by coronal mass ejections, we analyze whether the properties of the shocks in the corona inferred from combining extreme-ultraviolet (EUV) and white-light (WL) observations from multiple vantage points together with magnetohydrodynamic (MHD) simulations of the corona can be used to determine the release of SEPs into different regions of the heliosphere and hence determine the longitudinal extent of the SEP events. We analyze the SEP events observed on 2011 November 3, 2013 April 11, and 2014 February 25 over a wide range of heliolongitudes. MHD simulations provide the characteristics of the background medium where shocks propagate, in particular the Alfvén and sound speed profiles that allow us to determine both the extent of the EUV waves in the low corona and the fast magnetosonic Mach number (M FM) of the shocks. The extent of the EUV waves in the low corona is controlled by this background medium and does not coincide with the extent of the SEP events in the heliosphere. Within the uncertainties of (I) the extent and speed of the shock inferred from EUV and WL images and (II) the assumptions made in the MHD models, we follow the evolution of M FM at the region of the shock magnetically connected to each spacecraft. The estimated release times of the first SEPs measured by each spacecraft does not coincide with the time when the M FM at this region exceeds a given threshold.

 X-RAYING THE DARK SIDE OF VENUS—SCATTER FROM VENUS’ MAGNETOTAIL?

DOE Office of Scientific and Technical Information (OSTI.GOV)

Afshari, M.; Peres, G.; Petralia, A.

We analyze significant X-ray, EUV, and UV emission coming from the dark side of Venus observed with Hinode /XRT and Solar Dynamics Observatory /Atmospheric Imaging Assembly ( SDO /AIA) during a transit across the solar disk that occurred in 2012. As a check we have analyzed an analogous Mercury transit that occurred in 2006. We have used the latest version of the Hinode /XRT point spread function to deconvolve Venus and Mercury X-ray images, to remove instrumental scattering. After deconvolution, the flux from Venus’ shadow remains significant while that of Mercury becomes negligible. Since stray light contamination affects the XRT Ti-poly filtermore » data we use, we performed the same analysis with XRT Al-mesh filter data, not affected by the light leak. Even the latter data show residual flux. We have also found significant EUV (304 Å, 193 Å, 335 Å) and UV (1700 Å) flux in Venus’ shadow, measured with SDO /AIA. The EUV emission from Venus’ dark side is reduced, but still significant, when deconvolution is applied. The light curves of the average flux of the shadow in the X-ray, EUV, and UV bands appear different as Venus crosses the solar disk, but in any of them the flux is, at any time, approximately proportional to the average flux in a ring surrounding Venus, and therefore proportional to that of the solar regions around Venus’ obscuring disk line of sight. The proportionality factor depends on the band. This phenomenon has no clear origin; we suggest that it may be due to scatter occurring in the very long magnetotail of Venus.« less

On the Link between the Release of Solar Energetic Particles Measured at Widespread Heliolongitudes and the Properties of the Associated Coronal Shocks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lario, D.; Kwon, R.-Y.; Raouafi, N. E.

Under the paradigm that the main agents in the acceleration of solar energetic particles (SEPs) are shocks initially driven by coronal mass ejections, we analyze whether the properties of the shocks in the corona inferred from combining extreme-ultraviolet (EUV) and white-light (WL) observations from multiple vantage points together with magnetohydrodynamic (MHD) simulations of the corona can be used to determine the release of SEPs into different regions of the heliosphere and hence determine the longitudinal extent of the SEP events. We analyze the SEP events observed on 2011 November 3, 2013 April 11, and 2014 February 25 over a widemore » range of heliolongitudes. MHD simulations provide the characteristics of the background medium where shocks propagate, in particular the Alfvén and sound speed profiles that allow us to determine both the extent of the EUV waves in the low corona and the fast magnetosonic Mach number ( M {sub FM}) of the shocks. The extent of the EUV waves in the low corona is controlled by this background medium and does not coincide with the extent of the SEP events in the heliosphere. Within the uncertainties of (i) the extent and speed of the shock inferred from EUV and WL images and (ii) the assumptions made in the MHD models, we follow the evolution of M {sub FM} at the region of the shock magnetically connected to each spacecraft. The estimated release times of the first SEPs measured by each spacecraft does not coincide with the time when the M {sub FM} at this region exceeds a given threshold.« less

``Big Bang" for NASA's Buck: Nearly Three Years of EUVE Mission Operations at UCB

NASA Astrophysics Data System (ADS)

Stroozas, B. A.; Nevitt, R.; McDonald, K. E.; Cullison, J.; Malina, R. F.

1999-12-01

After over seven years in orbit, NASA's Extreme Ultraviolet Explorer (EUVE) satellite continues to perform flawlessly and with no significant loss of science capabilities. EUVE continues to produce important and exciting science results and, with reentry not expected until 2003-2004, many more such discoveries await. In the nearly three years since the outsourcing of EUVE from NASA's Goddard Space Flight Center, the small EUVE operations team at the University of California at Berkeley (UCB) has successfully conducted all aspects of the EUVE mission -- from satellite operations, science and mission planning, and data processing, delivery, and archival, to software support, systems administration, science management, and overall mission direction. This paper discusses UCB's continued focus on automation and streamlining, in all aspects of the Project, as the means to maximize EUVE's overall scientific productivity while minimizing costs. Multitasking, non-traditional work roles, and risk management have led to expanded observing capabilities while achieving significant cost reductions and maintaining the mission's historical 99 return. This work was funded under NASA Cooperative Agreement NCC5-138.

Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

NASA Astrophysics Data System (ADS)

Goldberg, Kenneth A.; Naulleau, Patrick P.; Bokor, Jeffrey; Chapman, Henry N.

2002-07-01

As the quality of optical systems for extreme ultraviolet lithography improves, high-accuracy wavefront metrology for alignment and qualification becomes ever more important. To enable the development of diffraction-limited EUV projection optics, visible-light and EUV interferometries must work in close collaboration. We present a detailed comparison of EUV and visible-light wavefront measurements performed across the field of view of a lithographic-quality EUV projection optical system designed for use in the Engineering Test Stand developed by the Virtual National Laboratory and the EUV Limited Liability Company. The comparisons reveal that the present level of RMS agreement lies in the 0.3-0.4-nm range. Astigmatism is the most significant aberration component for the alignment of this optical system; it is also the dominant term in the discrepancy, and the aberration with the highest measurement uncertainty. With EUV optical systems requiring total wavefront quality in the (lambda) EUV/50 range, and even higher surface-figure quality for the individual mirror elements, improved accuracy through future comparisons, and additional studies, are required.

Efficient extreme-UV-to-extreme-UV conversion by four-wave mixing with intense near-IR pulses in highly charged ion plasmas

NASA Astrophysics Data System (ADS)

Chu, Hsu-hsin; Wang, Jyhpyng

2018-05-01

Nonlinear optics in the extreme-ultraviolet (EUV) has been limited by lack of transparent media and small conversion efficiency. To overcome this problem we explore the advantage of using multiply charged ion plasmas as the interacting media between EUV and intense near-infrared (NIR) pulses. Such media are transparent to EUV and can withstand intense NIR driving pulses without damage. We calculate the third-order nonlinear polarizabilities of Ar2 + and Ar3 + ions for EUV and NIR four-wave mixing by using the well-proven Cowan code and find that the EUV-to-EUV conversion efficiency as high as 26% can be expected for practical experimental configurations using multi-terawatt NIR lasers. Such a high efficiency is possible because the driving pulse intensity can be scaled up to several orders of magnitude higher than in conventional nonlinear media, and the group-velocity and phase mismatch are insignificant at the experimental plasma densities. This effective scheme of wave mixing can be utilized for ultrafast EUV waveform measurement and control as well as wavelength conversion.

Twisting solar coronal jet launched at the boundary of an active region

NASA Astrophysics Data System (ADS)

Schmieder, B.; Guo, Y.; Moreno-Insertis, F.; Aulanier, G.; Yelles Chaouche, L.; Nishizuka, N.; Harra, L. K.; Thalmann, J. K.; Vargas Dominguez, S.; Liu, Y.

2013-11-01

Aims: A broad jet was observed in a weak magnetic field area at the edge of active region NOAA 11106 that also produced other nearby recurring and narrow jets. The peculiar shape and magnetic environment of the broad jet raised the question of whether it was created by the same physical processes of previously studied jets with reconnection occurring high in the corona. Methods: We carried out a multi-wavelength analysis using the EUV images from the Atmospheric Imaging Assembly (AIA) and magnetic fields from the Helioseismic and Magnetic Imager (HMI) both on-board the Solar Dynamics Observatory, which we coupled to a high-resolution, nonlinear force-free field extrapolation. Local correlation tracking was used to identify the photospheric motions that triggered the jet, and time-slices were extracted along and across the jet to unveil its complex nature. A topological analysis of the extrapolated field was performed and was related to the observed features. Results: The jet consisted of many different threads that expanded in around 10 minutes to about 100 Mm in length, with the bright features in later threads moving faster than in the early ones, reaching a maximum speed of about 200 km s-1. Time-slice analysis revealed a striped pattern of dark and bright strands propagating along the jet, along with apparent damped oscillations across the jet. This is suggestive of a (un)twisting motion in the jet, possibly an Alfvén wave. Bald patches in field lines, low-altitude flux ropes, diverging flow patterns, and a null point were identified at the basis of the jet. Conclusions: Unlike classical λ or Eiffel-tower-shaped jets that appear to be caused by reconnection in current sheets containing null points, reconnection in regions containing bald patches seems to be crucial in triggering the present jet. There is no observational evidence that the flux ropes detected in the topological analysis were actually being ejected themselves, as occurs in the violent phase of blowout jets; instead, the jet itself may have gained the twist of the flux rope(s) through reconnection. This event may represent a class of jets different from the classical quiescent or blowout jets, but to reach that conclusion, more observational and theoretical work is necessary.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

2011-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

Mask technology for EUV lithography

NASA Astrophysics Data System (ADS)

Bujak, M.; Burkhart, Scott C.; Cerjan, Charles J.; Kearney, Patrick A.; Moore, Craig E.; Prisbrey, Shon T.; Sweeney, Donald W.; Tong, William M.; Vernon, Stephen P.; Walton, Christopher C.; Warrick, Abbie L.; Weber, Frank J.; Wedowski, Marco; Wilhelmsen, Karl C.; Bokor, Jeffrey; Jeong, Sungho; Cardinale, Gregory F.; Ray-Chaudhuri, Avijit K.; Stivers, Alan R.; Tejnil, Edita; Yan, Pei-yang; Hector, Scott D.; Nguyen, Khanh B.

1999-04-01

Extreme UV Lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. EUVL uses 10-14 nm light as envisioned by the EUV Limited Liability Company, a consortium formed by Intel and supported by Motorola and AMD to perform R and D work at three national laboratories. Much work has already taken place, with the first prototypical cameras operational at 13.4 nm using low energy laser plasma EUV light sources to investigate issues including the source, camera, electro- mechanical and system issues, photoresists, and of course the masks. EUV lithograph masks are fundamentally different than conventional photolithographic masks as they are reflective instead of transmissive. EUV light at 13.4 nm is rapidly absorbed by most materials, thus all light transmission within the EUVL system from source to silicon wafer, including EUV reflected from the mask, is performed by multilayer mirrors in vacuum.

Degradation-Free Spectrometers for Solar EUV Measurements: A Progress Report

NASA Astrophysics Data System (ADS)

Wieman, S. R.; Judge, D. L.; Didkovsky, L. V.

2009-12-01

Solar EUV observations will be made using two new degradation-free EUV spectrometers on a sounding rocket flight scheduled for Summer 2010. The two instruments, a rare gas photoionization-based Optics-Free Spectrometer (OFS) and a Dual Grating Spectrometer (DGS), are filter-free and optics-free. OFS can measure the solar EUV spectrum with a spectral resolution comparable to that of grating-based EUV spectrometers. The DGS is designed to provide solar irradiance at Lyman-alpha and He II to overlap EUV observations from SOHO/SEM and SDO/EVE. Electronic and mechanical designs for the flight prototype instruments and results of tests performed with the instruments in the laboratory are reported. The spectrometers are being developed and demonstrated as part of the Degradation Free Spectrometers (DFS) project under NASA’s Low Cost Access to Space (LCAS) program and are supported by NASA Grant NNX08BA12G.

Single-expose patterning development for EUV lithography

NASA Astrophysics Data System (ADS)

De Silva, Anuja; Petrillo, Karen; Meli, Luciana; Shearer, Jeffrey C.; Beique, Genevieve; Sun, Lei; Seshadri, Indira; Oh, Taehwan; Han, Seulgi; Saulnier, Nicole; Lee, Joe; Arnold, John C.; Hamieh, Bassem; Felix, Nelson M.; Furukawa, Tsuyoshi; Singh, Lovejeet; Ayothi, Ramakrishnan

2017-03-01

Initial readiness of EUV (extreme ultraviolet) patterning was demonstrated in 2016 with IBM Alliance's 7nm device technology. The focus has now shifted to driving the 'effective' k1 factor and enabling the second generation of EUV patterning. With the substantial cost of EUV exposure there is significant interest in extending the capability to do single exposure patterning with EUV. To enable this, emphasis must be placed on the aspect ratios, adhesion, defectivity reduction, etch selectivity, and imaging control of the whole patterning process. Innovations in resist materials and processes must be included to realize the full entitlement of EUV lithography at 0.33NA. In addition, enhancements in the patterning process to enable good defectivity, lithographic process window, and post etch pattern fidelity are also required. Through this work, the fundamental material challenges in driving down the effective k1 factor will be highlighted.

Plans for the extreme ultraviolet explorer data base

NASA Technical Reports Server (NTRS)

Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

1988-01-01

The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

An Extreme-ultraviolet Wave Generating Upward Secondary Waves in a Streamer-like Solar Structure

NASA Astrophysics Data System (ADS)

Zheng, Ruisheng; Chen, Yao; Feng, Shiwei; Wang, Bing; Song, Hongqiang

2018-05-01

Extreme-ultraviolet (EUV) waves, spectacular horizontally propagating disturbances in the low solar corona, always trigger horizontal secondary waves (SWs) when they encounter the ambient coronal structure. We present the first example of upward SWs in a streamer-like structure after the passing of an EUV wave. This event occurred on 2017 June 1. The EUV wave happened during a typical solar eruption including a filament eruption, a coronal mass ejection (CME), and a C6.6 flare. The EUV wave was associated with quasi-periodic fast propagating (QFP) wave trains and a type II radio burst that represented the existence of a coronal shock. The EUV wave had a fast initial velocity of ∼1000 km s‑1, comparable to high speeds of the shock and the QFP wave trains. Intriguingly, upward SWs rose slowly (∼80 km s‑1) in the streamer-like structure after the sweeping of the EUV wave. The upward SWs seemed to originate from limb brightenings that were caused by the EUV wave. All of the results show that the EUV wave is a fast-mode magnetohydrodynamic (MHD) shock wave, likely triggered by the flare impulses. We suggest that part of the EUV wave was probably trapped in the closed magnetic fields of the streamer-like structure, and upward SWs possibly resulted from the release of slow-mode trapped waves. It is believed that the interplay of the strong compression of the coronal shock and the configuration of the streamer-like structure is crucial for the formation of upward SWs.

Apollo-Soyuz survey of the extreme-ultraviolet/soft X-ray background

DOE Office of Scientific and Technical Information (OSTI.GOV)

Stern, R.; Bowyer, S.

1979-06-15

The results of an extensive sky survey of the extreme-ultraviolet (EUV)/soft X-ray background are reported. The data were obtained with a telescope, designed and calibrated at the University of California at Berkeley, which observed EUV sources and the diffuse background as part of the Apollo-Soyuz mission in 1975 July. With a primary field of view of 2 /sup 0/.3 +- 0 /sup 0/.1 FWHM and four EUV bandpass filters (16--25, 20--73, 80--108, and 80--250 eV), the EUV telescope obtained useful background data for 21 sky points, 11 large angle scans, and an additional group of short observations of both types.more » Analysis of the data reveals an intense 80--108 eV diffuse flux of 4.0 +- 1.3 photons cm/sup -2/ sr/sup -1/ eV/sup -1/ (broad-band weighted average). This is roughly a factor of 10 higher than the corresponding 150--280 eV average intensity and confirms the earlier results of Cash, Malina, and Stern. Galactic contributions to the background intensity at still lower energies are most likely masked by large fluxes of geocoronal or interplanetary solar-scattered resonance radiation; however, we drive upper limits to the local galactic background of 2 x 10/sup 4/ and 6 x 10/sup 2/ photons cm/sup -2/ sr/sup -1/ eV/sup -1/ averaged over the 16--25 eV and 20--73 eV bands, respectively. The uniformity of the background flux is uncertain due to limitations in the statistical accuracy of the data; we discuss probable upper limits to any spatial anisotropy. No evidence is found for a correlation between the telescope count rate and Earth-based parameters (zenith angle, Sun angle, etc.) for E> or approx. =80 eV. Unlike some previous claims for the soft X-ray background, no simple dependence upon galactic latitude is seen.Fitting models of thermal emission to the Apollo-Soyuz data yields constraints on model parameters that are consistent for a limited range of temperatures with the EUV results of Cash, Malina, and Stern and the soft X-ray data of Burstein et al.« less

Reconstruction and analysis of erythemal UV radiation time series from Hradec Králové (Czech Republic) over the past 50 years

NASA Astrophysics Data System (ADS)

Čížková, Klára; Láska, Kamil; Metelka, Ladislav; Staněk, Martin

2018-02-01

This paper evaluates the variability of erythemal ultraviolet (EUV) radiation from Hradec Králové (Czech Republic) in the period 1964-2013. The EUV radiation time series was reconstructed using a radiative transfer model and additional empirical relationships, with the final root mean square error of 9.9 %. The reconstructed time series documented the increase in EUV radiation doses in the 1980s and the 1990s (up to 15 % per decade), which was linked to the steep decline in total ozone (10 % per decade). The changes in cloud cover were the major factor affecting the EUV radiation doses especially in the 1960s, 1970s, and at the beginning of the new millennium. The mean annual EUV radiation doses in the decade 2004-2013 declined by 5 %. The factors affecting the EUV radiation doses differed also according to the chosen integration period (daily, monthly, and annually): solar zenith angle was the most important for daily doses, cloud cover, and surface UV albedo for their monthly means, and the annual means of EUV radiation doses were most influenced by total ozone column. The number of days with very high EUV radiation doses increased by 22 % per decade, the increase was statistically significant in all seasons except autumn. The occurrence of the days with very high EUV doses was influenced mostly by low total ozone column (82 % of days), clear-sky or partly cloudy conditions (74 % of days) and by increased surface albedo (19 % of days). The principal component analysis documented that the occurrence of days with very high EUV radiation doses was much affected by the positive phase of North Atlantic Oscillation with an Azores High promontory reaching over central Europe. In the stratosphere, a strong Arctic circumpolar vortex and the meridional inflow of ozone-poor air from the southwest were favorable for the occurrence of days with very high EUV radiation doses. This is the first analysis of the relationship between the high EUV radiation doses and macroscale circulation patterns, and therefore more attention should be given also to other dynamical variables that may affect the solar UV radiation on the Earth surface.

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

NASA Astrophysics Data System (ADS)

Fomenkov, Igor; Brandt, David; Ershov, Alex; Schafgans, Alexander; Tao, Yezheng; Vaschenko, Georgiy; Rokitski, Slava; Kats, Michael; Vargas, Michael; Purvis, Michael; Rafac, Rob; La Fontaine, Bruno; De Dea, Silvia; LaForge, Andrew; Stewart, Jayson; Chang, Steven; Graham, Matthew; Riggs, Daniel; Taylor, Ted; Abraham, Mathew; Brown, Daniel

2017-06-01

Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML's NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

New Views of the Solar Corona from STEREO and SDO

NASA Astrophysics Data System (ADS)

Vourlidas, A.

2012-01-01

In the last few years, we have been treated to an unusual visual feast of solar observations of the corona in EUV wavelengths. The observations from the two vantage points of STEREO/SECCHI are now capturing the entire solar atmosphere simultaneously in four wavelengths. The SDO/AIA images provide us with arcsecond resolution images of the full visible disk in ten wavelengths. All these data are captured with cadences of a few seconds to a few minutes. In this talk, I review some intriguing results from our first attempts to deal with these observations which touch upon the problems of coronal mass ejection initiation and solar wind generation. I will also discuss data processing techniques that may help us recover even more information from the images. The talk will contain a generous portion of beautiful EUV images and movies of the solar corona.

Global Plasmaspheric Imaging: A New "Light" Focusing on Familiar Questions

NASA Technical Reports Server (NTRS)

Adrian, M. L.; Six, N. Frank (Technical Monitor)

2002-01-01

Until recently plasmaspheric physics, for that matter, magnetospheric physics as a whole, has relied primarily on single point in-situ measurement, theory, modeling, and a considerable amount of extrapolation in order to envision the global structure of the plasmasphere. This condition changed with the launch of the IMAGE satellite in March 2000. Using the Extreme Ultraviolet (EUV) imager on WAGE, we can now view the global structure of the plasmasphere bathed in the glow of resonantly scattered 30.4 nm radiation allowing the space physics community to view the dynamics of this global structure as never before. This talk will: (1) define the plasmasphere from the perspective of plasmaspheric physics prior to March 2000; (2) present a review of EUV imaging optics and the IMAGE mission; and focus on efforts to understand an old and familiar feature of plasmaspheric physics, embedded plasmaspheric density troughs, in this new global light with the assistance of forward modeling.

Miniature Extreme Ultraviolet Solar Radiometers

NASA Astrophysics Data System (ADS)

McMullin, D. R.; Seely, J. F.; Bremer, J.; Jones, A. R.; Vest, R.; Sakdinawat, A.

2015-12-01

Free-standing zone plates for use in EUV solar radiometers have been fabricated using electron beam lithography and calibrated at the NIST SURF synchrotron facility. The radiometers that we are developing use zone plates (ZPs) to focus the total solar irradiance in narrow EUV spectral bands and measure it with negligible sensitivity to field angle and polarization, and with greater accuracy and greater long-term stability than radiometers that have alternative architectures. These radiometers are easy to accommodate on spacecraft due to their small size, low mass, low power requirements, low data rates, and modest pointing requirements. A proto-type instrument will be presented with performance characteristics and spacecraft resource requirements for hosting these new instruments. The compact size of the optical train make these zone plates attractive for small CubeSats. The robustness of the compact design makes these radiometers available for a large variety of applications.

Bright Points and Subflares in Ultraviolet Lines and X-Rays

NASA Technical Reports Server (NTRS)

Rovira, M.; Schmieder, B.; Demoulin, P.; Simnett, G. M.; Hagyard, M. J.; Reichmann, E.; Reichmann, E.; Tandberg-Hanssen, E.

1999-01-01

We have analyzed an active region which was observed in H.alpha (Multichannel Subtractive Double Pass Spectrograph), in UV lines (SMM/UVSP), and in X-rays (SMM/HXIS). In this active region there were only a few subflares and many small bright points visible in UV and in X-rays. Using an extrapolation based on the Fourier transform, we have computed magnetic field lines connecting different photospheric magnetic polarities from ground-based magnetograms. Along the magnetic inversion lines we find two different zones: (1) a high-shear region (> 70 deg) where subflares occur, and (2) a low-shear region along the magnetic inversion line where UV bright points are observed. In these latter regions the magnetic topology is complex with a mixture of polarities. According to the velocity field observed in the Si IV lamda.1402 line and the extrapolation of the magnetic field, we notice that each UV bright point is consistent with emission from low-rising loops with downflows at both ends. We notice some hard X-ray emissions above the bright-point regions with temperatures up to 8 x 10(exp 6) K, which suggests some induced reconnection due to continuous emergence of new flux. This reconnection is also enhanced by neighboring subflares.

Seasonal variability of Martian ion escape through the plume and tail from MAVEN observations

NASA Astrophysics Data System (ADS)

Dong, Y.; Fang, X.; Brain, D. A.; McFadden, J. P.; Halekas, J. S.; Connerney, J. E. P.; Eparvier, F.; Andersson, L.; Mitchell, D.; Jakosky, B. M.

2017-04-01

We study the Mars Atmosphere and Volatile Evolution spacecraft observations of Martian planetary ion escape during two time periods: 11 November 2014 to 19 March 2015 and 4 June 2015 to 24 October 2015, with the focus on understanding the seasonal variability of Martian ion escape in response to the solar extreme ultraviolet (EUV) flux. We organize the >6 eV O+ ion data by the upstream electric field direction to estimate the escape rates through the plume and tail. To investigate the ion escape dependence on the solar EUV flux, we constrain the solar wind dynamic pressure and interplanetary magnetic filed strength and compare the ion escape rates through the plume and tail in different energy ranges under high and low EUV conditions. We found that the total >6 eV O+ escape rate increases from 2 to 3 × 1024 s-1 as the EUV irradiance increases by almost the same factor, mostly on the <1 keV tailward escape. The plume escape rate does not vary significantly with EUV. The relative contribution from the plume to the total escape varies between 30% and 20% from low to high EUV. Our results suggest that the Martian ion escape is sensitive to the seasonal EUV variation, and the contribution from plume escape becomes more important under low EUV conditions.

Update on EUV radiometry at PTB

NASA Astrophysics Data System (ADS)

Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Haase, Anton; Knorr, Florian; Mentzel, Heiko; Puls, Jana; Schönstedt, Anja; Sintschuk, Michael; Soltwisch, Victor; Stadelhoff, Christian; Scholze, Frank

2016-03-01

The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellicles to adopt an approved method from optical lithography for EUVL needs completely new thin membranes which have not been available before. To support these developments, PTB with its decades of experience [1] in EUV metrology [2] provides a wide range of actinic and non actinic measurements at in-band EUV wavelengths as well as out of band. Two dedicated, complimentary EUV beamlines [3] are available for radiometric [4,5] characterizations benefiting from small divergence or from adjustable spot size respectively. The wavelength range covered reaches from below 1 nm to 45 nm [6] for the EUV beamlines [7] to longer wavelengths if in addition the VUV beamline is employed. The standard spot size is 1 mm by 1 mm with an option to go as low as 0.1 mm to 0.1 mm. A separate beamline offers an exposure setup. Exposure power levels of 20 W/cm2 have been employed in the past, lower fluencies are available by attenuation or out of focus exposure. Owing to a differential pumping stage, the sample can be held under defined gas conditions during exposure. We present an updated overview on our instrumentation and analysis capabilities for EUV metrology and provide data for illustration.

RECURRENT TWO-SIDED LOOP-TYPE JETS DUE TO A BIPOLE EMERGING BELOW TRANSEQUATORIAL LOOPS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Jiang, Yunchun; Bi, Yi; Yang, Jiayan

2013-10-01

We report four successive two-sided loop-type jets centered around a small bipole emerging below transequatorial interconnecting loops (TILs). They occurred at the very first emerging stage of the bipole in a short recurrent period of only 12 minutes. During this term, the emerging flux consisted of a main bipole, but showed a mixed-polarity field morphology with the appearance and then disappearance of a small magnetic feature in its interior. However, no associated cancellation of the bipole with the nearby flux was observed in this process. In multi-wavelength EUV images, the jets started nearly simultaneously and were similar in appearance. Eachmore » jet consisted of a pair of components that connected to two bright footpoints around the bipole and were ejected from the emergence location to opposite directions. While the two bright footpoints were separated by a gap and had consistent evolution with that of the bipole, the jet base region covering them accordingly showed four episodes of emission enhancement that peaked approximately at the jet start times. Compatible with the magnetic-reconnection jet mechanism, the recurrent two-sided loop-type jets are explained as a result of reconnection between the emerging bipole and the overlying TILs.« less

Classification and printability of EUV mask defects from SEM images

NASA Astrophysics Data System (ADS)

Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

2017-10-01

Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM-to-Aerial printability) analysis of every defect. First, a defect-free or reference mask SEM is rendered from the post-OPC design, and the defective signature is detected from the defect-reference difference image. These signatures help assess the true nature of the defect as evident in e-beam imaging; for example, excess or missing absorber, line-edge roughness, contamination, etc. Next, defect and reference contours are extracted from the grayscale SEM images and fed into the simulation engine with an EUV scanner model to generate corresponding EUV defect and reference aerial images. These are then analyzed for printability and dispositioned using an Aerial Image Analyzer (AIA) application to automatically measure and determine the amount of CD errors. Thus by integrating EUV ADC and S2A applications together, every defect detection is characterized for its type and printability which is essential for not only determining which defects to repair, but also in monitoring the performance of EUV mask process tools. The accuracy of the S2A print modeling has been verified with other commercially-available simulators, and will also be verified with actual wafer print results. With EUV lithography progressing towards volume manufacturing at 5nm technology, and the likelihood of EBMI inspectors approaching the horizon, the EUV ADC-S2A system will continue serving an essential role of dispositioning defects off e-beam imaging.

Maskless EUV lithography: an already difficult technology made even more complicated?

NASA Astrophysics Data System (ADS)

Chen, Yijian

2012-03-01

In this paper, we present the research progress made in maskless EUV lithography and discuss the emerging opportunities for this disruptive technology. It will be shown nanomirrors based maskless approach is one path to costeffective and defect-free EUV lithography, rather than making it even more complicated. The focus of our work is to optimize the existing vertical comb process and scale down the mirror size from several microns to sub-micron regime. The nanomirror device scaling, system configuration, and design issues will be addressed. We also report our theoretical and simulation study of reflective EUV nanomirror based imaging behavior. Dense line/space patterns are formed with an EUV nanomirror array by assigning a phase shift of π to neighboring nanomirrors. Our simulation results show that phase/intensity imbalance is an inherent characteristic of maskless EUV lithography while it only poses a manageable challenge to CD control and process window. The wafer scan and EUV laser jitter induced image blur phenomenon is discussed and a blurred imaging theory is constructed. This blur effect is found to degrade the image contrast at a level that mainly depends on the wafer scan speed.

High reflectance coatings for space applications in the EUV

NASA Technical Reports Server (NTRS)

Keski-Kuha, Ritva A. M.; Gum, Jeffrey S.; Osantowski, John F.; Fleetwood, Charles M.

1993-01-01

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency and made possible to consider more complex optical designs in the EUV. The importance of recent developments in chemical vapor deposited silicon carbide (CVD-SiC), SiC films and multilayer coatings is discussed in the context of EUV instrumentation design. The EUV performance of these coatings as well as some strengths and problem areas for their use in space will be addressed.

Tolerance of image enhancement brightness and contrast in lateral cephalometric digital radiography for Steiner analysis

NASA Astrophysics Data System (ADS)

Rianti, R. A.; Priaminiarti, M.; Syahraini, S. I.

2017-08-01

Image enhancement brightness and contrast can be adjusted on lateral cephalometric digital radiographs to improve image quality and anatomic landmarks for measurement by Steiner analysis. To determine the limit value for adjustments of image enhancement brightness and contrast in lateral cephalometric digital radiography for Steiner analysis. Image enhancement brightness and contrast were adjusted on 100 lateral cephalometric radiography in 10-point increments (-30, -20, -10, 0, +10, +20, +30). Steiner analysis measurements were then performed by two observers. Reliabilities were tested by the Interclass Correlation Coefficient (ICC) and significance tested by ANOVA or the Kruskal Wallis test. No significant differences were detected in lateral cephalometric analysis measurements following adjustment of the image enhancement brightness and contrast. The limit value of adjustments of the image enhancement brightness and contrast associated with incremental 10-point changes (-30, -20, -10, 0, +10, +20, +30) does not affect the results of Steiner analysis.

Modeling 13.3nm Fe XXIII Flare Emissions Using the GOES-R EXIS Instrument

NASA Astrophysics Data System (ADS)

Rook, H.; Thiemann, E.

2017-12-01

The solar EUV spectrum is dominated by atomic transitions in ionized atoms in the solar atmosphere. As solar flares evolve, plasma temperatures and densities change, influencing abundances of various ions, changing intensities of different EUV wavelengths observed from the sun. Quantifying solar flare spectral irradiance is important for constraining models of Earth's atmosphere, improving communications quality, and controlling satellite navigation. However, high time cadence measurements of flare irradiance across the entire EUV spectrum were not available prior to the launch of SDO. The EVE MEGS-A instrument aboard SDO collected 0.1nm EUV spectrum data from 2010 until 2014, when the instrument failed. No current or future instrument is capable of similar high resolution and time cadence EUV observation. This necessitates a full EUV spectrum model to study EUV phenomena at Earth. It has been recently demonstrated that one hot flare EUV line, such as the 13.3nm Fe XXIII line, can be used to model cooler flare EUV line emissions, filling the role of MEGS-A. Since unblended measurements of Fe XXIII are typically unavailable, a proxy for the Fe XXIII line must be found. In this study, we construct two models of this line, first using the GOES 0.1-0.8nm soft x-ray (SXR) channel as the Fe XXIII proxy, and second using a physics-based model dependent on GOES emission measure and temperature data. We determine that the more sophisticated physics-based model shows better agreement with Fe XXIII measurements, although the simple proxy model also performs well. We also conclude that the high correlation between Fe XXIII emissions and the GOES 0.1-0.8nm band is because both emissions tend to peak near the GOES emission measure peak despite large differences in their contribution functions.

ILT optimization of EUV masks for sub-7nm lithography

NASA Astrophysics Data System (ADS)

Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

2017-06-01

The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

Design requirements for a stand alone EUV interferometer

NASA Astrophysics Data System (ADS)

Michallon, Ph.; Constancias, C.; Lagrange, A.; Dalzotto, B.

2008-03-01

EUV lithography is expected to be inserted for the 32/22 nm nodes with possible extension below. EUV resist availability remains one of the main issues to be resolved. There is an urgent need to provide suitable tools to accelerate resist development and to achieve resolution, LER and sensitivity specifications simultaneously. An interferometer lithography tool offers advantages regarding conventional EUV exposure tool. It allows the evaluation of resists, free from the deficiencies of optics and mask which are limiting the achieved resolution. Traditionally, a dedicated beam line from a synchrotron, with limited access, is used as a light source in EUV interference lithography. This paper identifies the technology locks to develop a stand alone EUV interferometer using a compact EUV source. It will describe the theoretical solutions adopted and especially look at the feasibility according to available technologies. EUV sources available on the market have been evaluated in terms of power level, source size, spatial coherency, dose uniformity, accuracy, stability and reproducibility. According to the EUV source characteristics, several optic designs were studied (simple or double gratings). For each of these solutions, the source and collimation optic specifications have been determined. To reduce the exposure time, a new grating technology will also be presented allowing to significantly increasing the transmission system efficiency. The optical grating designs were studied to allow multi-pitch resolution print on the same exposure without any focus adjustment. Finally micro mechanical system supporting the gratings was studied integrating the issues due to vacuum environment, alignment capability, motion precision, automation and metrology to ensure the needed placement control between gratings and wafer. A similar study was carried out for the collimation-optics mechanical support which depends on the source characteristics.

Actinic defect counting statistics over 1-cm2 area of EUVL mask blank

NASA Astrophysics Data System (ADS)

Jeong, Seongtae; Lai, Chih-wei; Rekawa, Senajith; Walton, Christopher C.; Bokor, Jeffrey

2000-07-01

As a continuation of comparison experiments between EUV inspection and visible inspection of defects on EUVL mask blanks, we report on the result of an experiment where the EUV defect inspection tool is used to perform at-wavelength defect counting over 1 cm2 of EUVL mask blank. Initial EUV inspection found five defects over the scanned area and the subsequent optical scattering inspection was able to detect all of the five defects. Therefore, if there are any defects that are only detectable by EUV inspection, the density is lower than the order of unity per cm2. An upgrade path to substantially increase the overall throughput of the EUV inspection system is also identified in the manuscript.

Study on photochemical analysis system (VLES) for EUV lithography

NASA Astrophysics Data System (ADS)

Sekiguchi, A.; Kono, Y.; Kadoi, M.; Minami, Y.; Kozawa, T.; Tagawa, S.; Gustafson, D.; Blackborow, P.

2007-03-01

A system for photo-chemical analysis of EUV lithography processes has been developed. This system has consists of 3 units: (1) an exposure that uses the Z-Pinch (Energetiq Tech.) EUV Light source (DPP) to carry out a flood exposure, (2) a measurement system RDA (Litho Tech Japan) for the development rate of photo-resists, and (3) a simulation unit that utilizes PROLITH (KLA-Tencor) to calculate the resist profiles and process latitude using the measured development rate data. With this system, preliminary evaluation of the performance of EUV lithography can be performed without any lithography tool (Stepper and Scanner system) that is capable of imaging and alignment. Profiles for 32 nm line and space pattern are simulated for the EUV resist (Posi-2 resist by TOK) by using VLES that hat has sensitivity at the 13.5nm wavelength. The simulation successfully predicts the resist behavior. Thus it is confirmed that the system enables efficient evaluation of the performance of EUV lithography processes.

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

DOE Office of Scientific and Technical Information (OSTI.GOV)

Oyama, Tomoko Gowa, E-mail: ohyama.tomoko@qst.go.jp; Oshima, Akihiro; Tagawa, Seiichi, E-mail: tagawa@sanken.osaka-u.ac.jp

2016-08-15

It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, wemore » calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).« less

Ionospheric Change and Solar EUV Irradiance

NASA Astrophysics Data System (ADS)

Sojka, J. J.; David, M.; Jensen, J. B.; Schunk, R. W.

2011-12-01

The ionosphere has been quantitatively monitored for the past six solar cycles. The past few years of observations are showing trends that differ from the prior cycles! Our good statistical relationships between the solar radio flux index at 10.7 cm, the solar EUV Irradiance, and the ionospheric F-layer peak density are showing indications of divergence! Present day discussion of the Sun-Earth entering a Dalton Minimum would suggest change is occurring in the Sun, as the driver, followed by the Earth, as the receptor. The dayside ionosphere is driven by the solar EUV Irradiance. But different components of this spectrum affect the ionospheric layers differently. For a first time the continuous high cadence EUV spectra from the SDO EVE instrument enable ionospheric scientists the opportunity to evaluate solar EUV variability as a driver of ionospheric variability. A definitive understanding of which spectral components are responsible for the E- and F-layers of the ionosphere will enable assessments of how over 50 years of ionospheric observations, the solar EUV Irradiance has changed. If indeed the evidence suggesting the Sun-Earth system is entering a Dalton Minimum periods is correct, then the comprehensive EVE solar EUV Irradiance data base combined with the ongoing ionospheric data bases will provide a most fortuitous fiduciary reference baseline for Sun-Earth dependencies. Using the EVE EUV Irradiances, a physics based ionospheric model (TDIM), and 50 plus years of ionospheric observation from Wallops Island (Virginia) the above Sun-Earth ionospheric relationship will be reported on.

Bright Points and Subflares in UV Lines and in X-Rays

NASA Technical Reports Server (NTRS)

Rovira, M.; Schmieder, B.; Demoulin, P.; Simnett, G. M.; Hagyard, M. J.; Reichmann, E.; Tandberg-Hanssen, E.

1998-01-01

We have analysed an active region which was observed in Halpha (MSDP), UV lines (SMM/UVSP), and in X rays (SMM/HXIS). In this active region there were only a few subflares and many small bright points visible in UV and in X rays. Using an extrapolation based on the Fourier transform we have computed magnetic field lines connecting different photospheric magnetic polarities from ground-based magnetograms. Along the magnetic inversion lines we find 2 different zones: 1. a high shear region (less than 70 degrees) where subflares occur 2. a low shear region along the magnetic inversion line where UV bright points are observed.

Fluctuations of the intergalactic ionization field at redshift z ~ 2

NASA Astrophysics Data System (ADS)

Agafonova, I. I.; Levshakov, S. A.; Reimers, D.; Hagen, H.-J.; Tytler, D.

2013-04-01

Aims: To probe the spectral energy distribution (SED) of the ionizing background radiation at z ≲ 2 and to specify the sources contributing to the intergalactic radiation field. Methods: The spectrum of a bright quasar HS 1103+6416 (zem = 2.19) contains five successive metal-line absorption systems at zabs = 1.1923, 1.7193, 1.8873, 1.8916, and 1.9410. The systems are optically thin and reveal multiple lines of different metal ions with the ionization potentials lying in the extreme ultraviolet (EUV) range (~1 Ryd to ~0.2 keV). For each system, the EUV SED of the underlying ionization field is reconstructed by means of a special technique developed for solving the inverse problem in spectroscopy. For the zabs = 1.8916 system, the analysis also involves the He I resonance lines of the Lyman series and the He iλ504 Å continuum, which are seen for the first time in any cosmic object except the Sun. Results: From one system to another, the SED of the ionizing continuum changes significantly, indicating that the intergalactic ionization field at z ≲ 2 fluctuates at the scale of at least Δz ~ 0.004. This is consistent with Δz ≲ 0.01 estimated from He II and H I Lyman-α forest measurements between the redshifts 2 and 3. A radiation intensity break by approximately an order of magnitude at E = 4 Ryd in SEDs restored for the zabs = 1.1923, 1.8873, 1.8916, and 1.9410 systems points to quasars as the main sources of the ionizing radiation. The SED variability is mostly caused by a small number of objects contributing at any given redshift to the ionizing background; at scales Δz ≳ 0.05, the influence of local radiation sources becomes significant. A remarkable SED restored for the zabs = 1.7193 system, with a sharp break shifted to E ~ 3.5 Ryd and a subsequent intensity decrease by ~1.5 dex, indicates a source with comparable inputs of both hard (active galactic nuclei, AGN) and soft (stellar) radiation components. Such a continuum can be emitted by (ultra) luminous infrared galaxies, many of which reveal both a strong AGN activity and intense star formation in the circumnuclear regions.

SolarSoft Desat Package for the Recovery of Saturated AIA Flare Images

NASA Astrophysics Data System (ADS)

Schwartz, Richard Alan; Torre, Gabriele; Piana, Michele; Massone, AnnaMaria

2015-04-01

The dynamic range of EUV images has been limited by the problem of CCD saturation as seen countless times in movies of solare flares made using the Solar Dynamics Observatory’s Atmospheric Imaging Assembly (SDO AIA). Concurrent with the saturation are the eight rays emanating from the saturation locus which are the result of diffraction off the wire meshes that support the EUV passband filters. This is the problem and its solution in a nutshell. By utilizing techniques similar to those used for making images from the rotating modulation collimators on the Ramaty High Energy Solar Spectroscopic Imager (RHESSI) we have developed a software package that can be used to make images of the EUV flare kernels in a highly automated way as described in Schwartz et al. (2014). Starting from cutouts centered around a flaring region, the software uses the point-spread-function (PSF) of the diffraction pattern to identify and reconstruct the region of the primary saturation. The software also uses the best information available to reconstruct the general scene obscured from overflow saturation and subtracts away the diffraction fringes. It is not a total correction for the PSF but is meant to provide the flare images above all. The software is freely available and distributed within the DESAT package of Solar Software.(Schwartz, R. A., Torre, G., & Piana, M. (2014), Astrophysical Journal Letters, 793, LL23 )

DOE Office of Scientific and Technical Information (OSTI.GOV)

Szulagyi, Judit; Pascucci, Ilaria; Abraham, Peter

Mid-infrared atomic and ionic line ratios measured in spectra of pre-main-sequence stars are sensitive indicators of the hardness of the radiation field impinging on the disk surface. We present a low-resolution Spitzer IRS search for [Ar II] at 6.98 {mu}m, [Ne II] at 12.81 {mu}m, and [Ne III] 15.55 {mu}m lines in 56 transitional disks. These objects, characterized by reduced near-infrared but strong far-infrared excess emission, are ideal targets to set constraints on the stellar radiation field onto the disk, because their spectra are not contaminated by shock emission from jets/outflows or by molecular emission lines. After demonstrating that wemore » can detect [Ne II] lines and recover their fluxes from the low-resolution spectra, here we report the first detections of [Ar II] lines toward protoplanetary disks. We did not detect [Ne III] emission in any of our sources. Our [Ne II]/[Ne III] line flux ratios combined with literature data suggest that a soft-EUV or X-ray spectrum produces these gas lines. Furthermore, the [Ar II]/[Ne II] line flux ratios point to a soft X-ray and/or soft-EUV stellar spectrum as the ionization source of the [Ar II] and [Ne II] emitting layer of the disk. If the soft X-ray component dominates over the EUV, then we would expect larger photoevaporation rates and, hence, a reduction of the time available to form planets.« less

Reconnection-Driven Coronal-Hole Jets with Gravity and Solar Wind

NASA Technical Reports Server (NTRS)

Karpen, J. T.; Devore, C. R.; Antiochos, S. K.; Pariat, E.

2017-01-01

Coronal-hole jets occur ubiquitously in the Sun's coronal holes, at EUV and X-ray bright points associated with intrusions of minority magnetic polarity. The embedded-bipole model for these jets posits that they are driven by explosive, fast reconnection between the stressed closed field of the embedded bipole and the open field of the surrounding coronal hole. Previous numerical studies in Cartesian geometry, assuming uniform ambient magnetic field and plasma while neglecting gravity and solar wind, demonstrated that the model is robust and can produce jet-like events in simple configurations. We have extended these investigations by including spherical geometry,gravity, and solar wind in a nonuniform, coronal hole-like ambient atmosphere. Our simulations confirm that the jet is initiated by the onset of a kink-like instability of the internal closed field, which induces a burst of reconnection between the closed and external open field, launching a helical jet. Our new results demonstrate that the jet propagation is sustained through the outer corona, in the form of a traveling nonlinear Alfven wave front trailed by slower-moving plasma density enhancements that are compressed and accelerated by the wave. This finding agrees well with observations of white-light coronal-hole jets, and can explain microstreams and torsional Alfven waves detected in situ in the solar wind. We also use our numerical results to deduce scaling relationships between properties of the coronal source region and the characteristics of the resulting jet, which can be tested against observations.

Defect tolerant transmission lithography mask

DOEpatents

Vernon, Stephen P.

2000-01-01

A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

THE FORMATION OF AN INVERSE S-SHAPED ACTIVE-REGION FILAMENT DRIVEN BY SUNSPOT MOTION AND MAGNETIC RECONNECTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yan, X. L.; Xue, Z. K.; Wang, J. C.

2016-11-20

We present a detailed study of the formation of an inverse S-shaped filament prior to its eruption in active region NOAA 11884 from 2013 October 31 to November 2. In the initial stage, clockwise rotation of a small positive sunspot around the main negative trailing sunspot formed a curved filament. Then the small sunspot cancelled with the negative magnetic flux to create a longer active-region filament with an inverse S-shape. At the cancellation site a brightening was observed in UV and EUV images and bright material was transferred to the filament. Later the filament erupted after cancellation of two oppositemore » polarities below the upper part of the filament. Nonlinear force-free field extrapolation of vector photospheric fields suggests that the filament may have a twisted structure, but this cannot be confirmed from the current observations.« less

EUVE observations of the Moon

NASA Technical Reports Server (NTRS)

Gladstone, G. R.; Mcdonald, J. S.; Boyd, W. T.

1993-01-01

During its all-sky survey, the Extreme Ultraviolet Explorer (EUVE) satellite observed the Moon several times at first and last quarters, and once near the Dec. 10, 1992 lunar eclipse. We present a preliminary reduction and analysis of this data, in the form of EUV images of the Moon and derived albedos.

The Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.; Lampton, M.; Finley, D.; Paresce, F.; Penegor, G.; Heetderks, H.

1982-01-01

The Extreme Ultraviolet Explorer Mission is described. The purpose of this mission is to search the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation (100 to 1000 A). The search will be accomplished with the use of three EUV telescopes, each sensitive to different bands within the EUV band. A fourth telescope will perform a higher sensitivity search of a limited sample of the sky in a single EUV band. In six months, the entire sky will be scanned at a sensitivity level comparable to existing surveys in other more traditional astronomical bandpasses.

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

2009-03-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Caudillo, Roman; Chandhok, Manish

2010-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. Readiness of EUV materials is currently one high risk area according to recent assessments made at the 2009 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data collected utilizing Intel's Micro-Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <= 12.5mJ/cm2 with <= 4nm LWR.

Utilizing the EUVE Innovative Technology Testbed to Reduce Operations Cost for Present and Future Orbiting Mission

NASA Technical Reports Server (NTRS)

1997-01-01

This report summarizes work done under Cooperative Agreement (CA) on the following testbed projects: TERRIERS - The development of the ground systems to support the TERRIERS satellite mission at Boston University (BU). HSTS - The application of ARC's Heuristic Scheduling Testbed System (HSTS) to the EUVE satellite mission. SELMON - The application of NASA's Jet Propulsion Laboratory's (JPL) Selective Monitoring (SELMON) system to the EUVE satellite mission. EVE - The development of the EUVE Virtual Environment (EVE), a prototype three-dimensional (3-D) visualization environment for the EUVE satellite and its sensors, instruments, and communications antennae. FIDO - The development of the Fault-Induced Document Officer (FIDO) system, a prototype application to respond to anomalous conditions by automatically searching for, retrieving, and displaying relevant documentation for an operators use.

Protection efficiency of a standard compliant EUV reticle handling solution

NASA Astrophysics Data System (ADS)

He, Long; Lystad, John; Wurm, Stefan; Orvek, Kevin; Sohn, Jaewoong; Ma, Andy; Kearney, Patrick; Kolbow, Steve; Halbmaier, David

2009-03-01

For successful implementation of extreme ultraviolet lithography (EUVL) technology for late cycle insertion at 32 nm half-pitch (hp) and full introduction for 22 nm hp high volume production, the mask development infrastructure must be in place by 2010. The central element of the mask infrastructure is contamination-free reticle handling and protection. Today, the industry has already developed and balloted an EUV pod standard for shipping, transporting, transferring, and storing EUV masks. We have previously demonstrated that the EUV pod reticle handling method represents the best approach in meeting EUVL high volume production requirements, based on then state-of-the-art inspection capability at ~53nm polystyrene latex (PSL) equivalent sensitivity. In this paper, we will present our latest data to show defect-free reticle handling is achievable down to 40 nm particle sizes, using the same EUV pod carriers as in the previous study and the recently established world's most advanced defect inspection capability of ~40 nm SiO2 equivalent sensitivity. The EUV pod is a worthy solution to meet EUVL pilot line and pre-production exposure tool development requirements. We will also discuss the technical challenges facing the industry in refining the EUV pod solution to meet 22 nm hp EUVL production requirements and beyond.

Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

NASA Astrophysics Data System (ADS)

Larivière, Stéphane; Wilson, Christopher J.; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen H.; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Béral, Christophe; Van den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryoung-han; McIntyre, Greg; Ronse, Kurt; Bömmels, Jürgen; Tőkei, Zsolt; Mocuta, Dan

2018-03-01

The semiconductor scaling roadmap shows the continuous node to node scaling to push Moore's law down to the next generations. In that context, the foundry N5 node requires 32nm metal pitch interconnects for the advanced logic Back- End of Line (BEoL). 193immersion usage now requires self-aligned and/or multiple patterning technique combinations to enable such critical dimension. On the other hand, EUV insertion investigation shows that 32nm metal pitch is still a challenge but, related to process flow complexity, presents some clear motivations. Imec has already evaluated on test chip vehicles with different patterning approaches: 193i SAQP (Self-Aligned Quadruple Patterning), LE3 (triple patterning Litho Etch), tone inversion, EUV SE (Single Exposure) with SMO (Source-mask optimization). Following the run path in the technology development for EUV insertion, imec N7 platform (iN7, corresponding node to the foundry N5) is developed for those BEoL layers. In this paper, following technical motivation and development learning, a comparison between the iArF SAQP/EUV block hybrid integration scheme and a single patterning EUV flow is proposed. These two integration patterning options will be finally compared from current morphological and electrical criteria.

Clean induced feature CD shift of EUV mask

NASA Astrophysics Data System (ADS)

Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

2016-05-01

EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber/ARC layer, as the quartz substrate can be hardly modified by the wet process. For EUV Masks chemical modification of the Ru capping layer - thinning, oxidization etc. are rather more probable and we need to take into account, how this effects can influence the CD measurement process. CD changes measured can be interpreted as either change in the feature size, or modification of the chemical nature of both absorber/ARC layer stack and the Ru capping layer. In our work we try to separate the effect of absorber and Ru/capping layer on the CD shift observed and propose independent way of estimation both parameters.

Progress in coherent lithography using table-top extreme ultraviolet lasers

NASA Astrophysics Data System (ADS)

Li, Wei

Nanotechnology has drawn a wide variety of attention as interesting phenomena occurs when the dimension of the structures is in the nanometer scale. The particular characteristics of nanoscale structures had enabled new applications in different fields in science and technology. Our capability to fabricate these nanostructures routinely for sure will impact the advancement of nanoscience. Apart from the high volume manufacturing in semiconductor industry, a small-scale but reliable nanofabrication tool can dramatically help the research in the field of nanotechnology. This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief review of the main characteristics of table-top EUV lasers will be addressed concentrating on its high power and large coherence radius that enable the lithography application described herein. The development of a Talbot EUV lithography system which is capable of printing 50nm half pitch nanopatterns will be illustrated in chapter III. A detailed discussion of its resolution limit will be presented followed by the development of X-Y-Z positioning stage, the fabrication protocol for diffractive EUV mask, and the pattern transfer using self- developed ion beam etching, and the dose control unit. In addition, this dissertation demonstrated the capability to fabricate functional periodic nanostructures using Talbot EUV lithography. After that, resolution enhancement techniques like multiple exposure, displacement Talbot EUV lithography, fractional Talbot EUV lithography, and Talbot lithography using 18.9nm amplified spontaneous emission laser will be demonstrated. Chapter IV will describe a hybrid EUV lithography which combines the Talbot imaging and interference lithography rendering a high resolution interference pattern whose lattice is modified by a custom designed Talbot mask. In other words, this method enables filling the arbitrary Talbot cell with ultra-fine interference nanofeatures. Detailed optics modeling, system design and experiment results using He-Ne laser and table top EUV laser are included. The last part of chapter IV will analyze its exclusive advantages over traditional Talbot or interference lithography.

Probing the Production of Extreme-ultraviolet Late-phase Solar Flares Using the Model Enthalpy-based Thermal Evolution of Loops

NASA Astrophysics Data System (ADS)

Dai, Yu; Ding, Mingde

2018-04-01

Recent observations in extreme-ultraviolet (EUV) wavelengths reveal an EUV late phase in some solar flares that is characterized by a second peak in warm coronal emissions (∼3 MK) several tens of minutes to a few hours after the soft X-ray (SXR) peak. Using the model enthalpy-based thermal evolution of loops (EBTEL), we numerically probe the production of EUV late-phase solar flares. Starting from two main mechanisms of producing the EUV late phase, i.e., long-lasting cooling and secondary heating, we carry out two groups of numerical experiments to study the effects of these two processes on the emission characteristics in late-phase loops. In either of the two processes an EUV late-phase solar flare that conforms to the observational criteria can be numerically synthesized. However, the underlying hydrodynamic and thermodynamic evolutions in late-phase loops are different between the two synthetic flare cases. The late-phase peak due to a long-lasting cooling process always occurs during the radiative cooling phase, while that powered by a secondary heating is more likely to take place in the conductive cooling phase. We then propose a new method for diagnosing the two mechanisms based on the shape of EUV late-phase light curves. Moreover, from the partition of energy input, we discuss why most solar flares are not EUV late flares. Finally, by addressing some other factors that may potentially affect the loop emissions, we also discuss why the EUV late phase is mainly observed in warm coronal emissions.

EUV and Magnetic Activities Associated with Type-I Solar Radio Bursts

NASA Astrophysics Data System (ADS)

Li, C. Y.; Chen, Y.; Wang, B.; Ruan, G. P.; Feng, S. W.; Du, G. H.; Kong, X. L.

2017-06-01

Type-I bursts ( i.e. noise storms) are the earliest-known type of solar radio emission at the meter wavelength. They are believed to be excited by non-thermal energetic electrons accelerated in the corona. The underlying dynamic process and exact emission mechanism still remain unresolved. Here, with a combined analysis of extreme ultraviolet (EUV), radio and photospheric magnetic field data of unprecedented quality recorded during a type-I storm on 30 July 2011, we identify a good correlation between the radio bursts and the co-spatial EUV and magnetic activities. The EUV activities manifest themselves as three major brightening stripes above a region adjacent to a compact sunspot, while the magnetic field there presents multiple moving magnetic features (MMFs) with persistent coalescence or cancelation and a morphologically similar three-part distribution. We find that the type-I intensities are correlated with those of the EUV emissions at various wavelengths with a correlation coefficient of 0.7 - 0.8. In addition, in the region between the brightening EUV stripes and the radio sources there appear consistent dynamic motions with a series of bi-directional flows, suggesting ongoing small-scale reconnection there. Mainly based on the induced connection between the magnetic motion at the photosphere and the EUV and radio activities in the corona, we suggest that the observed type-I noise storms and the EUV brightening activities are the consequence of small-scale magnetic reconnection driven by MMFs. This is in support of the original proposal made by Bentley et al. ( Solar Phys. 193, 227, 2000).

EUV efficiency of a 6000-grooves per mm diffraction grating

NASA Technical Reports Server (NTRS)

Hurwitz, Mark; Bowyer, Stuart; Edelstein, Jerry; Harada, Tatsuo; Kita, Toshiaki

1990-01-01

In order to explore whether grooves ruled mechanically at a density of 6000 per mm can perform well at EUV wavelengths, a sample grating is measured with this density in an EUV calibration facility. Measurements are presented of the planar uniform line-space diffraction grating's efficiency and large-angle scattering.

A study of EUV emission from the O4f star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1995-01-01

Our 20 ks observation did not allow us to carry out our primary objective, i.e., to test the limitations of deeply embedded EUV and X-ray sources. However, it did provide a very useful constraint in our analysis of a newly acquired high S/N ROSAT PSPC X-ray spectrum of Zeta Pup. In addition, modifications to our stellar wind opacity code have been preformed to investigate the sensitivity of the EUV opacity energy range to different photospheric model flux inputs and different wind structures. These analyses provided the justification for a 140 ks follow up EUVE Cycle III observation of this star. We have recently been informed that our requested observation has been accepted as a Type 1 target for Cycle III. The remainder of this report focuses on the following: (1) a brief background on the status of X-ray emission from OB stars; (2) a discussion on the importance of EUV observations; (3) a discussion of our scientific objectives; and (4) a summary of our technical approach for our Cycle III observation (including the predicted EUV counts for various lines.)

Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

NASA Astrophysics Data System (ADS)

Kandel, Yudhishthir; Chandonait, Jonathan; Melvin, Lawrence S.; Marokkey, Sajan; Yan, Qiliang; Grzeskowiak, Steven; Painter, Benjamin; Denbeaux, Gregory

2017-03-01

Extreme ultraviolet (EUV) lithography at 13.5 nm stands at the crossroads of next generation patterning technology for high volume manufacturing of integrated circuits. Photo resist models that form the part of overall pattern transform model for lithography play a vital role in supporting this effort. The physics and chemistry of these resists must be understood to enable the construction of accurate models for EUV Optical Proximity Correction (OPC). In this study, we explore the possibility of improving EUV photo-resist models by directly correlating the parameters obtained from experimentally measured atomic scale physical properties; namely, the effect of interaction of EUV photons with photo acid generators in standard chemically amplified EUV photoresist, and associated electron energy loss events. Atomic scale physical properties will be inferred from the measurements carried out in Electron Resist Interaction Chamber (ERIC). This study will use measured physical parameters to establish a relationship with lithographically important properties, such as line edge roughness and CD variation. The data gathered from these measurements is used to construct OPC models of the resist.

Availability of underlayer application to EUV process

NASA Astrophysics Data System (ADS)

Kosugi, Hitoshi; Fonseca, Carlos; Iwao, Fumiko; Marumoto, Hiroshi; Kim, Hyun-Woo; Cho, Kyoungyong; Park, Cheol-Hong; Park, Chang-Min; Na, Hai-Sub; Koh, Cha-Won; Cho, Hanku

2011-04-01

EUV lithography is one of the most promising technologies for the fabrication of beyond 30nm HP generation devices. However, it is well-known that EUV lithography still has significant challenges. A great concern is the change of resist material for EUV resist process. EUV resist material formulations will likely change from conventional-type materials. As a result, substrate dependency needs to be understood. TEL has reported that the simulation combined with experiments is a good way to confirm the substrate dependency. In this work the application of HMDS treatment and SiON introduction, as an underlayer, are studied to cause a footing of resist profile. Then, we applied this simulation technique to Samsung EUV process. We will report the benefit of this simulation work and effect of underlayer application. Regarding the etching process, underlayer film introduction could have significant issues because the film that should be etched off increases. For that purpose, thinner films are better for etching. In general, thinner films may have some coating defects. We will report the coating coverage performance and defectivity of ultra thin film coating.

The EUVE Proposal Database

NASA Astrophysics Data System (ADS)

Christian, C. A.; Olson, E. C.

1993-01-01

The proposal database and scheduling system for the Extreme Ultraviolet Explorer is described. The proposal database has been implemented to take input for approved observations selected by the EUVE Peer Review Panel and output target information suitable for the scheduling system to digest. The scheduling system is a hybrid of the SPIKE program and EUVE software which checks spacecraft constraints, produces a proposed schedule and selects spacecraft orientations with optimal configurations for acquiring star trackers, etc. This system is used to schedule the In Orbit Calibration activities that took place this summer, following the EUVE launch in early June 1992. The strategy we have implemented has implications for the selection of approved targets, which have impacted the Peer Review process. In addition, we will discuss how the proposal database, founded on Sybase, controls the processing of EUVE Guest Observer data.

Spectroscopy and Photometry of EUVE J1429-38.0:An Eclipsing Magnetic Cataclysmic Variable

NASA Astrophysics Data System (ADS)

Howell, Steve B.; Craig, Nahide; Roberts, Bryce; McGee, Paddy; Sirk, Martin

1997-06-01

EUVE J1429-38.0 was originally discovered as a variable source by the Extreme Ultraviolet Explorer (EUVE) satellite. We present new optical observations which unambiguously confirm this star to be an eclipsing magnetic system with an orbital period of 4() h 46() m. The photometric data are strongly modulated by ellipsoidal variations during low states which allow a system inclination of near 80 degrees to be determined. Our time-resolved optical spectra, which cover only about one-third of the orbital cycle, indicate the clear presence of a gas stream. During high states, EUVE J1429-38.0 shows ~ 1 mag deep eclipses and the apparent formation of a partial accretion disk. EUVE J1429-38.0 presents the observer with properties of both the AM Herculis and the DQ Herculis types of magnetic cataclysmic variable.

Hα Surges Initiated by Newly-emerging Satellite Magnetic Fields

NASA Astrophysics Data System (ADS)

Wang, Jun-feng; Zhou, Tuan-hui; Ji, Hai-sheng

2014-01-01

On July 22, 2011 and in the active region NOAA 11259 there ap- peared the event of the ejection of solar atmospheric Hα surges. According to the full-disc Hα observations of the Big Bear Solar Observatory in United States, three consecutive surges at one and the same place in the north of the main spot of the active region were discovered. The trajectories of these three surges exhib- ited the figure of straight lines, and their integral configuration is like an inverted Eiffel Tower. The first two surges are quite similar, and in each of them there appeared two bright points in the northern part of the main spot. After several minutes, the surges appeared in the midst of bright points. When the bright- ness of the bright points attained the maximum value, the surges spouted out from the midst of bright points. And after reaching the maximum altitude, they quickly vanished. Before the ejection of the third surge took place, no bright points appeared. Besides, its maximal altitude is merely one half of that of the first two surges. Via a comparison with the SDO/HMI (Solar Dynamics Obser- vatory/Helioseismic and Magnetic Imager) data of radial magnetic fields, it is found that in more than one hour before the appearance of the first surge there emerged bipolar magnetic fields in the region of ejection. Besides, in several min- utes before the ejection of each Hα surge the magnetic fluxes of positive polarity diminished. Via our analysis it is found that there appeared reconnections be- tween the newly emerging satellite magnetic fields and the preexisting magnetic fields in the spot, and this caused the continuous ejections of Hα surges.

Inter-Calibration of EIS, XRT and AIA using Active Region and Bright Point Data

NASA Technical Reports Server (NTRS)

Mulu-Moore, Fana M.; Winebarger, Amy R.; Winebarger, Amy R.; Farid, Samaiyah I.

2012-01-01

Certain limitations in our solar instruments have created the need to use several instruments together for long term and/or large field of view studies. We will, therefore, present an intercalibration study of the EIS, XRT and AIA instruments using active region and bright point data. We will use the DEMs calculated from EIS bright point observations to determine the expected AIA and XRT intensities. We will them compare to the observed intensities and calculate a correction factor. We will consider data taken over a year to see if there is a time dependence to the correction factor. We will then determine if the correction factors are valid for active region observations.

Study of the model of calibrating differences of brightness temperature from geostationary satellite generated by time zone differences

NASA Astrophysics Data System (ADS)

Li, Weidong; Shan, Xinjian; Qu, Chunyan

2010-11-01

In comparison with polar-orbiting satellites, geostationary satellites have a higher time resolution and wider field of visions, which can cover eleven time zones (an image covers about one third of the Earth's surface). For a geostationary satellite panorama graph at a point of time, the brightness temperature of different zones is unable to represent the thermal radiation information of the surface at the same point of time because of the effect of different sun solar radiation. So it is necessary to calibrate brightness temperature of different zones with respect to the same point of time. A model of calibrating the differences of the brightness temperature of geostationary satellite generated by time zone differences is suggested in this study. A total of 16 curves of four positions in four different stages are given through sample statistics of brightness temperature of every 5 days synthetic data which are from four different time zones (time zones 4, 6, 8, and 9). The above four stages span January -March (winter), April-June (spring), July-September (summer), and October-December (autumn). Three kinds of correct situations and correct formulas based on curves changes are able to better eliminate brightness temperature rising or dropping caused by time zone differences.

EUV Irradiance Inputs to Thermospheric Density Models: Open Issues and Path Forward

NASA Astrophysics Data System (ADS)

Vourlidas, A.; Bruinsma, S.

2018-01-01

One of the objectives of the NASA Living With a Star Institute on "Nowcasting of Atmospheric Drag for low Earth orbit (LEO) Spacecraft" was to investigate whether and how to increase the accuracy of atmospheric drag models by improving the quality of the solar forcing inputs, namely, extreme ultraviolet (EUV) irradiance information. In this focused review, we examine the status of and issues with EUV measurements and proxies, discuss recent promising developments, and suggest a number of ways to improve the reliability, availability, and forecast accuracy of EUV measurements in the next solar cycle.

Carbon contamination topography analysis of EUV masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fan, Y.-J.; Yankulin, L.; Thomas, P.

2010-03-12

The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

Coronal "wave": Magnetic Footprint Of A Cme?

NASA Astrophysics Data System (ADS)

Attrill, Gemma; Harra, L. K.; van Driel-Gesztelyi, L.; Demoulin, P.; Wuelser, J.

2007-05-01

We propose a new mechanism for the generation of "EUV coronal waves". This work is based on new analysis of data from SOHO/EIT, SOHO/MDI & STEREO/EUVI. Although first observed in 1997, the interpretation of coronal waves as flare-induced or CME-driven remains a debated topic. We investigate the properties of two "classical" SOHO/EIT coronal waves in detail. The source regions of the associated CMEs possess opposite helicities & the coronal waves display rotations in opposite senses. We observe deep dimmings near the flare site & also widespread diffuse dimming, accompanying the expansion of the EIT wave. We report a new property of these EIT waves, namely, that they display dual brightenings: persistent ones at the outermost edge of the core dimming regions & simultaneously diffuse brightenings constituting the leading edge of the coronal wave, surrounding the expanding diffuse dimmings. We show that such behaviour is consistent with a diffuse EIT wave being the magnetic footprint of a CME. We propose a new mechanism where driven magnetic reconnections between the skirt of the expanding CME & quiet-Sun magnetic loops generate the observed bright diffuse front. The dual brightenings & widespread diffuse dimming are identified as innate characteristics of this process. In addition we present some of the first analysis of a STEREO/EUVI limb coronal wave. We show how the evolution of the diffuse bright front & dimmings can be understood in terms of the model described above. We show that an apparently stationary part of the bright front can be understood in terms of magnetic interchange reconnections between the expanding CME & the "open" magnetic field of a low-latitude coronal hole. We use both the SOHO/EIT & STEREO/EUVI events to demonstrate that through successive reconnections, this new model provides a natural mechanism via which CMEs can become large-scale in the lower corona.

THE BLOB CONNECTION: SEARCHING FOR LOW CORONAL SIGNATURES OF SOLAR POST-CME BLOBS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Schanche, Nicole E; Reeves, Katharine K; Webb, David F., E-mail: nschanche@cfa.harvard.edu

2016-11-01

Bright linear structures, thought to be indicators of a current sheet (CS), are often seen in Large Angle and Spectrometric Coronagraph (LASCO) on the Solar and Heliospheric Observatory (SOHO) white-light data in the wake of coronal mass ejections (CMEs). In a subset of these post-CME structures, relatively bright blobs are seen moving outward along the rays. These blobs have been interpreted as consequences of the plasmoid instability in the CS, and can help us to understand the dynamics of the reconnection. We examine several instances, taken largely from the SOHO /LASCO CME-rays Catalog, where these blobs are clearly visible inmore » white-light data. Using radially filtered, difference, wavelet enhanced, and multiscale Gaussian normalized images to visually inspect Solar Dynamics Observatory /Atmospheric Imaging Assembly (AIA) data in multiple wavelengths, we look for signatures of material that correspond both temporally and spatially to the later appearance of the blobs in LASCO/C2. Constraints from measurements of the blobs allow us to predict the expected count rates in DN pixel{sup −1} s{sup −1} for each AIA channel. The resulting values would make the blobs bright enough to be detectable at 1.2 R {sub ⊙}. However, we do not see conclusive evidence for corresponding blobs in the AIA data in any of the events. We do the same calculation for the “cartwheel CME,” an event in which blobs were seen in X-rays, and find that our estimated count rates are close to those observed. We suggest several possibilities for the absence of the EUV blobs including the formation of the blob higher than the AIA field of view, blob coalescence, and overestimation of blob densities.« less

The patterning center of excellence (CoE): an evolving lithographic enablement model

NASA Astrophysics Data System (ADS)

Montgomery, Warren; Chun, Jun Sung; Liehr, Michael; Tittnich, Michael

2015-03-01

As EUV lithography moves toward high-volume manufacturing (HVM), a key need for the lithography materials makers is access to EUV photons and imaging. The SEMATECH Resist Materials Development Center (RMDC) provided a solution path by enabling the Resist and Materials companies to work together (using SUNY Polytechnic Institute's Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) -based exposure systems), in a consortium fashion, in order to address the need for EUV photons. Thousands of wafers have been processed by the RMDC (leveraging the SUNY Poly CNSE/SEMATECH MET, SUNY Poly CNSE Alpha Demo Tool (ADT) and the SEMATECH Lawrence Berkeley MET) allowing many of the questions associated with EUV materials development to be answered. In this regard the activities associated with the RMDC are continuing. As the major Integrated Device Manufacturers (IDMs) have continued to purchase EUV scanners, Materials companies must now provide scanner based test data that characterizes the lithography materials they are producing. SUNY Poly CNSE and SEMATECH have partnered to evolve the RMDC into "The Patterning Center of Excellence (CoE)". The new CoE leverages the capability of the SUNY Poly CNSE-based full field ASML 3300 EUV scanner and combines that capability with EUV Microexposure (MET) systems resident in the SEMATECH RMDC to create an integrated lithography model which will allow materials companies to advance materials development in ways not previously possible.

SDO/AIA AND HINODE/EIS OBSERVATIONS OF INTERACTION BETWEEN AN EUV WAVE AND ACTIVE REGION LOOPS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Liheng; Zhang, Jun; Li, Ting

2013-09-20

We present detailed analysis of an extreme-ultraviolet (EUV) wave and its interaction with active region (AR) loops observed by the Solar Dynamics Observatory/Atmospheric Imaging Assembly and the Hinode EUV Imaging Spectrometer (EIS). This wave was initiated from AR 11261 on 2011 August 4 and propagated at velocities of 430-910 km s{sup –1}. It was observed to traverse another AR and cross over a filament channel on its path. The EUV wave perturbed neighboring AR loops and excited a disturbance that propagated toward the footpoints of these loops. EIS observations of AR loops revealed that at the time of the wavemore » transit, the original redshift increased by about 3 km s{sup –1}, while the original blueshift decreased slightly. After the wave transit, these changes were reversed. When the EUV wave arrived at the boundary of a polar coronal hole, two reflected waves were successively produced and part of them propagated above the solar limb. The first reflected wave above the solar limb encountered a large-scale loop system on its path, and a secondary wave rapidly emerged 144 Mm ahead of it at a higher speed. These findings can be explained in the framework of a fast-mode magnetosonic wave interpretation for EUV waves, in which observed EUV waves are generated by expanding coronal mass ejections.« less

Kr photoionized plasma induced by intense extreme ultraviolet pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A., E-mail: andrzej.bartnik@wat.edu.pl; Wachulak, P.; Fiedorowicz, H.

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Krmore » plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.« less

Nanoplasmonic generation of ultrashort EUV pulses

NASA Astrophysics Data System (ADS)

Choi, Joonhee; Lee, Dong-Hyub; Han, Seunghwoi; Park, In-Yong; Kim, Seungchul; Kim, Seung-Woo

2012-10-01

Ultrashort extreme-ultraviolet (EUV) light pulses are an important tool for time-resolved pump-probe spectroscopy to investigate the ultrafast dynamics of electrons in atoms and molecules. Among several methods available to generate ultrashort EUV light pulses, the nonlinear frequency upconversion process of high-harmonic generation (HHG) draws attention as it is capable of producing coherent EUV pulses with precise control of burst timing with respect to the driving near-infrared (NIR) femtosecond laser. In this report, we present and discuss our recent experimental data obtained by the plasmon-driven HHG method that generate EUV radiation by means of plasmonic nano-focusing of NIR femtosecond pulses. For experiment, metallic waveguides having a tapered hole of funnel shape inside were fabricated by adopting the focused-ion-beam process on a micro-cantilever substrate. The plasmonic field formed within the funnelwaveguides being coupled with the incident femtosecond pulse permitted intensity enhancement by a factor of ~350, which creates a hot spot of sub-wavelength size with intensities strong enough for HHG. Experimental results showed that with injection of noble gases into the funnel-waveguides, EUV radiation is generated up to wavelengths of 32 nm and 29.6 nm from Ar and Ne gas atoms, respectively. Further, it was observed that lower-order EUV harmonics are cut off in the HHG spectra by the tiny exit aperture of the funnel-waveguide.

Kr photoionized plasma induced by intense extreme ultraviolet pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

2016-04-01

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

Solar Demon: near real-time Flare, Dimming and EUV wave monitoring

NASA Astrophysics Data System (ADS)

Kraaikamp, Emil; Verbeeck, Cis

Dimmings and EUV waves have been observed routinely in EUV images since 1996. They are closely associated with coronal mass ejections (CMEs), and therefore provide useful information for early space weather alerts. On the one hand, automatic detection and characterization of dimmings and EUV waves can be used to gain better understanding of the underlying physical mechanisms. On the other hand, every dimming and EUV wave provides extra information on the associated front side CME, and can improve estimates of the geo-effectiveness and arrival time of the CME. Solar Demon has been designed to detect and characterize dimmings, EUV waves, as well as solar flares in near real-time on Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) data. The detection modules are running continuously at the Royal Observatory of Belgium on both quick-look data, as well as synoptic science data. The output of Solar Demon can be accessed in near real-time on the Solar Demon website, and includes images, movies, light curves, and the numerical evolution of several parameters. Solar Demon is the result of collaboration between the FP7 projects AFFECTS and COMESEP. Flare detections of Solar Demon are integrated into the COMESEP alert system. Here we present the Solar Demon detection algorithms and their output. We will show several interesting flare, dimming and EUV wave events, and present general statistics of the detections made so far during solar cycle 24.

Bright points and ejections observed on the sun by the KORONAS-FOTON instrument TESIS

NASA Astrophysics Data System (ADS)

Ulyanov, A. S.; Bogachev, S. A.; Kuzin, S. V.

2010-10-01

Five-second observations of the solar corona carried out in the FeIX 171 Å line by the KORONAS-FOTON instrument TESIS are used to study the dynamics of small-scale coronal structures emitting in and around coronal bright points. The small-scale structures of the lower corona display complex dynamics similar to those of magnetic loops located at higher levels of the solar corona. Numerous detected oscillating structures with sizes below 10 000 km display oscillation periods from 50 to 350 s. The period distributions of these structures are different for P < 150 s and P > 150 s, which implies that different oscillation modes are excited at different periods. The small-scale structures generate numerous flare-like events with energies 1024-1026 erg (nanoflares) and with a spatial density of one event per arcsecond or more observed over an area of 4 × 1011 km2. Nanoflares are not associated with coronal bright points, and almost uniformly cover the solar disk in the observation region. The ejections of solar material from the coronal bright points demonstrate velocities of 80-110 km/s.

EUV mirror based absolute incident flux detector

DOEpatents

Berger, Kurt W.

2004-03-23

A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.

Calibration techniques and results in the soft X-ray and extreme ultraviolet for components of the Extreme Ultraviolet Explorer Satellite

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Jelinsky, Patrick; Bowyer, Stuart

1986-01-01

The calibration facilities and techniques for the Extreme Ultraviolet Explorer (EUVE) from 44 to 2500 A are described. Key elements include newly designed radiation sources and a collimated monochromatic EUV beam. Sample results for the calibration of the EUVE filters, detectors, gratings, collimators, and optics are summarized.

Challenges of anamorphic high-NA lithography and mask making

NASA Astrophysics Data System (ADS)

Hsu, Stephen D.; Liu, Jingjing

2017-06-01

Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10.1117/12.2086074). To ensure no assist feature printing, the assist feature sizes need to be scaled with λ/NA. The extremely small SRAF width (below 25 nm on the reticle) is difficult to fabricate across the full reticle. In this paper, we introduce an innovative `attenuated SRAF' to improve SRAF manufacturability and still maintain the process window benefit. A new mask fabrication process is proposed to use existing mask-making capability to manufacture the attenuated SRAFs. The high-NA EUV system utilizes anamorphic reduction; 4× in the horizontal (slit) direction and 8× in the vertical (scanning) direction (J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150; B. Kneer, S. Migura, W. Kaiser, J. T. Neumann, J. van Schoot, in `Proc. SPIE9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94221G (2015) doi: 10.1117/12.2175488). For an anamorphic system, the magnification has an angular dependency, and thus, familiar mask specifications such as mask error factor (MEF) need to be redefined. Similarly, mask-manufacturing rule check (MRC) needs to consider feature orientation.

Exploring EUV Spicules Using 304 Angstrom He II Data from SDO AIA

NASA Technical Reports Server (NTRS)

Snyder, Ian R.; Sterling, Alphonse C.; Falconer, David A.; Moore, Ron L.

2014-01-01

We present results from a statistical study of He II 304 Angstrom Extreme Ultraviolet (EUV) spicules at the limb of the Sun. We also measured properties of one macrospicule; macrospicules are longer than most spicules, and much broader in width than spicules. We use high-cadence (12 second) and high-resolution (0.6 arcseconds pixels) resolution data from the Atmospheric Imaging Array (AIA) instrument on the Solar Dynamic Observatory (SDO). All of the observed events occurred near the solar north pole, where quiet Sun or coronal hole environments ensued. We examined the maximum lengths, maximum rise velocities, and lifetimes of 33 Extreme Ultraviolet (EUV) spicules and the macrospicule. For the bulk of the Extreme Ultraviolet (EUV) spicules these quantities are, respectively, approximately 10,000-40,000 kilometers, 20-100 kilometers per second, and approximately 100- approximately 1000 seconds. For the macrospicule the corresponding quantities were respectively approximately 60,000 kilometers, approximately 130 kilometers per second, approximately 1800 seconds, which is typical of macrospicules measured by other workers. Therefore macrospicules are taller, longer-lived, and faster than most Extreme Ultraviolet (EUV) spicules. The rise profiles of both the spicules and the macrospicules match well a second-order ("parabolic" ) trajectory, although the acceleration was often weaker than that of solar gravity in the profiles fitted to the trajectories. Our macrospicule also had an obvious brightening at its base at birth, while such brightening was not apparent for the Extreme Ultraviolet (EUV) spicules. Most of the Extreme Ultraviolet (EUV) spicules remained visible during their descent back to the solar surface, although a small percentage of the spicules and the macrospicule faded out before falling back to the surface. Our sample of macrospicules is not yet large enough to determine whether their initiation mechanism is identical to that of Extreme Ultraviolet (EUV) spicules.

Novel EUV mask black border and its impact on wafer imaging

NASA Astrophysics Data System (ADS)

Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-03-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.; Mrowka, Stanley; Soufli, Regina

2002-07-01

The performance of Mo/Si multilayer mirrors (MLMs) used to reflect UV (EUV) radiation in an EUV + hydrocarbon (NC) vapor environment can be improved by optimizing the silicon capping layer thickness on the MLM in order to minimize the initial buildup of carbon on MLMs. Carbon buildup is undesirable since it can absorb EUV radiation and reduce MLM reflectivity. A set of Mo/Si MLMs deposited on Si wafers was fabricated such that each MLM had a different Si capping layer thickness ranging form 2 nm to 7 nm. Samples from each MLM wafer were exposed to a combination of EUV light + (HC) vapors at the Advanced Light Source (ALS) synchrotron in order to determine if the Si capping layer thickness affected the carbon buildup on the MLMs. It was found that the capping layer thickness had a major influence on this 'carbonizing' tendency, with the 3 nm layer thickness providing the best initial resistance to carbonizing and accompanying EUV reflectivity loss in the MLM. The Si capping layer thickness deposited on a typical EUV optic is 4.3 nm. Measurements of the absolute reflectivities performed on the Calibration and Standards beamline at the ALS indicated the EUV reflectivity of the 3 nm-capped MLM was actually slightly higher than that of the normal, 4 nm Si-capped sample. These results show that he use of a 3 nm capping layer represents an improvement over the 4 nm layer since the 3 nm has both a higher absolute reflectivity and better initial resistance to carbon buildup. The results also support the general concept of minimizing the electric field intensity at the MLM surface to minimize photoelectron production and, correspondingly, carbon buildup in a EUV + HC vapor environment.

Prospects of DUV OoB suppression techniques in EUV lithography

NASA Astrophysics Data System (ADS)

Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

2014-04-01

Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

Free-electron laser emission architecture impact on extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

2017-10-01

Laser-produced plasma (LPP) EUV sources have demonstrated ˜125 W at customer sites, establishing confidence in EUV lithography (EUVL) as a viable manufacturing technology. However, for extension to the 3-nm technology node and beyond, existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multipatterning (requiring increased wafer throughput proportional to the number of exposure passes). Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should FELs become the preferred next-generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) self-amplified spontaneous emission, (2) regenerative amplifier, or (3) self-seeding. Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provides a framework for future FEL design and enablement for EUVL applications.

Evidence for a New Class of Extreme Ultraviolet Sources

NASA Technical Reports Server (NTRS)

Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

1997-01-01

Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

Adding EUV reflectance to aluminum-coated mirrors for space-based observation

NASA Astrophysics Data System (ADS)

Allred, David D.; Turley, R. Steven; Thomas, Stephanie M.; Willett, Spencer G.; Greenburg, Michael J.; Perry, Spencer B.

2017-09-01

Protective layers on aluminum mirror surfaces which can be removed via the use of atomic hydrogen or hydrogen plasmas at the point of use in space may allow an expansion of broad-band mirrors into the EUV. LUVOIR (large, UV-optical-IR telescope) is a potential NASA flagship space-based observatory of the 2020's or 30's. It would utilize the largest mirrors ever flown1 . Their reflective coating will almost certainly be aluminum, since such telescopes would profit from truly broad-band mirrors. To achieve reflectance over the broadest band, the top surface of such aluminum mirrors, however, needs to be bare, without the oxide layers that naturally form in air. This will open the 11 to 15 eV band. Since thin aluminum films are largely transparent between 15 and 70 eV an EUV mirror under the aluminum could make EUV bands such as 30.4 nm available for space-based astrophysics without sacrificing mirror IR, visible and UV reflectance. The local space environment for the observatory is sufficiently oxygen-free that the surface should remain bare for decades. We discuss protecting as-deposited aluminum mirrors with robust, oxygenimpenetrable, barrier layers applied in vacuo to the aluminum immediately after deposition and before air contact. The goal is that the barrier could also be cleanly, and relatively easily, removed once the mirror is in space. We propose hydrogen atoms as the means for removing the overcoat, since they can be expected to meet the criteria that the means is gentle enough to not roughen the mirror surface, and does not redeposit material on the mirror or other spacecraft components. We have investigated both organic and inorganic (such as, a-Si) hydrogen-removable films that can be applied to the aluminum immediately after its deposition have been investigated. We also examined the REVAP technique, using Cd and Zn. Agglomeration limited their effectiveness as barrier layers. That and dealing with the reevaporated atoms may limit their utility as barrier materials.

Method of fabricating reflection-mode EUV diffraction elements

DOEpatents

Naulleau, Patrick P.

2002-01-01

Techniques for fabricating a well-controlled, quantized-level, engineered surface that serves as substrates for EUV reflection multilayer overcomes problems associated with the fabrication of reflective EUV diffraction elements. The technique when employed to fabricate an EUV diffraction element that includes the steps of: (a) forming an etch stack comprising alternating layers of first and second materials on a substrate surface where the two material can provide relative etch selectivity; (b) creating a relief profile in the etch stack wherein the relief profile has a defined contour; and (c) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. For a typical EUV multilayer, if the features on the substrate are larger than 50 nm, the multilayer will be conformal to the substrate. Thus, the phase imparted to the reflected wavefront will closely match that geometrically set by the surface height profile.

EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas

NASA Astrophysics Data System (ADS)

Suzuki, C.; Koike, F.; Murakami, I.; Tamura, N.; Sudo, S.; Sakaue, H. A.; Nakamura, N.; Morita, S.; Goto, M.; Kato, D.; Nakano, T.; Higashiguchi, T.; Harte, C. S.; OʼSullivan, G.

2014-11-01

We present recent results on the extreme ultraviolet (EUV) spectroscopy of highly charged high Z ions in plasmas produced in the Large Helical Device (LHD) at the National Institute for Fusion Science. Tungsten, bismuth and lanthanide elements have recently been studied in the LHD in terms of their importance in fusion research and EUV light source development. In relatively low temperature plasmas, quasicontinuum emissions from open 4d or 4f subshell ions are predominant in the EUV region, while the spectra tend to be dominated by discrete lines from open 4s or 4p subshell ions in higher temperature plasmas. Comparative analyses using theoretical calculations and charge-separated spectra observed in an electron beam ion trap have been performed to achieve better agreement with the spectra measured in the LHD. As a result, databases on Z dependence of EUV spectra in plasmas have been widely extended.

Actinic imaging and evaluation of phase structures on EUV lithography masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mochi, Iacopo; Goldberg, Kenneth; Huh, Sungmin

2010-09-28

The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of themore » object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.« less

The Nature of the Flaring EUVE Companion to HD 43162

NASA Technical Reports Server (NTRS)

Kulkarni, Shrinivas R.

2005-01-01

The purpose of our program was to observe and characterize the companion to HD 43162, EUVE J0614-2354, which (serendipitously) experienced an enormous flare event during our EUVE observation of HD 43162, one of the nearby solar analogs that we observed during our survey of this population. Our observation was carried out and the data have been received and reduced. We are able to identify EUVE J0614-2354 in both the X-ray (EPIC MOS + PN) and the UV (OM) data, which provides a sub-arcsecond position for this source. Our findings are consistent with the analysis of Christian et al. (2003a,b), who identify EUVE J0614-2354 with a coronally-active M-dwarf star at distance d = 15 plus or minus 5pc. The X-ray spectrum from the EPIC data are also consistent with this identification.

Hemispherical Nature of EUV Shocks Revealed by SOHO, STEREO, and SDO Observations

NASA Technical Reports Server (NTRS)

Gopalswamy, Natchimuthuk; Nitta, N.; Akiyama, S.; Makela, P.; Yashiro, S.

2011-01-01

EUV wave transients associated with type II radio bursts are manifestation of CME-driven shocks in the solar corona. We use recent EUV wave observations from SOHO, STEREO, and SDO for a set of CMEs to show that the EUV transients have a spherical shape in the inner corona. We demonstrate this by showing that the radius of the EUV transient on the disk observed by one instrument is approximately equal to the height of the wave above the solar surface in an orthogonal view provided by another instrument. The study also shows that the CME-driven shocks often form very low in the corona at a heliocentric distance of 1.2 Rs, even smaller than the previous estimates from STEREO/CORl data (Gopalswamy et aI., 2009, Solar Phys. 259, 227). These results have important implications for the acceleration of solar energetic particles by CMEs

Design of a grazing incidence EUV imaging spectrometer for the solar orbiter ESA mission

NASA Astrophysics Data System (ADS)

Da Deppo, Vania; Poletto, Luca

2017-11-01

The paper describes the optical design and performance of an extreme-ultraviolet (EUV) spectrometer for imaging spectroscopy to be part of the scientific payload of the Solar Orbiter (SOLO) mission. The main scientific objectives are to study the solar polar region and observe in detail the evolution of corona structures from a favourable point of view at only 45 solar radii from the Sun (0.2 AU). The instrument concept is based on a grazing incidence telescope, (1200 m focal length, 18 arcmin x 18 arcmin FoV), in Wolter configuration couple to a normalincidence VLS grating spectrometer, which preserve the stigmaticity in an extended spectral region and in the whole field-of-view. The spectral range covered by the instrument is the 116-126 nm region at the first order and the 57-63 nm region at the second order. The spectral resolving element is 65 mÅ (I order), corresponding to a velocity resolution of 16 km/s.

Ultraviolet Spectroscopy of the Surfaces of the Inner Icy Saturnian Satellites

NASA Astrophysics Data System (ADS)

Hendrix, A. R.; Hansen, C. J.

2008-12-01

The Cassini mission has provided a unique opportunity to make high-resolution, multi-spectral measurements of Saturn's icy moons, to investigate their surface compositions, processes and evolution. Here we present results from the Ultraviolet Imaing Spectrograph (UVIS). This instrument allows for the first measurements of the icy satellites in the extreme ultraviolet (EUV) to far-ultraviolet (FUV) wavelength range. The icy satellites of the Saturn system exhibit a remarkable amount of variability: Dark, battered Phoebe orbiting at a distant 200 RS, black-and-white Iapetus, the wispy streaks of Dione, cratered Rhea and Mimas, bright Tethys and geologically active Enceladus. Phoebe, Iapetus and Hyperion all orbit largely outside Saturn's magnetosphere, while the inner icy satellites Mimas, Enceladus, Dione Tethys and Rhea all orbit within the magnetosphere. Furthermore, the inner icy satellites all orbit within the E-ring - so the extent of exogenic effects on these icy satellites is wide-ranging. We present an overview of UVIS results from Tethys, Dione, Mimas, Enceladus and Rhea, focusing on surface investigations. We expect that the UV signatures of these icy satellites are strongly influenced not only by their water ice composition, but by external effects and magnetospheric environments. We study the FUV reflectance spectra to learn about the surface composition, map out water ice grain size variations, investigate effects of coating by E-ring grains, examine disk-resolved and hemispheric compositional and brightness variations, and investigate the presence of radiation products. This is new work: FUV spectra of surfaces have not been well-studied in the past. Spectra of the inner icy moons have been used to better develop spectral models, to further understand existing lab data of water ice and to help with understanding instrument performance. Analysis is challenged by a lack of laboratory data in this wavelength region, but intriguing results are being found. We find that the FUV albedo is a critical tie- point to understand the composition of these moons -- important absorptions occur in the NUV-visible region. We present disk-integrated hemispherical reflectance spectra, and show that while Tethys and Dione exhibit strong UV leading-trailing differences, Mimas, Enceladus and Rhea do not. In the UV, Mimas is nearly as bright as Enceladus. Tethys is surprisingly dark in the UV. The visible-wavelength leading-trailing hemisphere albedo differences can be attributed to coating by E-ring grains; in the UV, a process appears to darken the trailing hemisphere of Tethys. We also investigate disk-resolved Enceladus spectra to understand spectral differences between the south polar tiger stripe region and elsewhere on the surface.

Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goldberg, Kenneth A.; Yashchuk, Valeriy

2007-12-01

What is the point of developing new high-brightness light sources if beamline optics won't be available to realize the goals of nano-focusing and coherence preservation? That was one of the central questions raised during a workshop at the 2007 Advanced Light Source Users Meeting. Titled, 'Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation', the workshop was organized by Kenneth Goldberg and Valeriy Yashchuk (both of Lawrence Berkeley National Laboratory, LBNL), and it brought together industry representatives and researchers from Japan, Europe, and the US to discuss the state of the art and to outline the optics requirements of newmore » light sources. Many of the presentations are viewable on the workshop website http://goldberg.lbl.gov/MetrologyWorkshop07/. Many speakers shared the same view of one of the most significant challenges facing the development of new high-brightness third and fourth generation x-ray, soft x-ray, and EUV light sources: these sources place extremely high demands on the surface quality of beamline optics. In many cases, the 1-2-nm surface error specs that define the outer bounds of 'diffraction-limited' quality are beyond the reach of leading facilities and optics vendors. To focus light to 50-nm focal spots, or smaller, from reflective optics and to preserve the high coherent flux that new sources make possible, the optical surface quality and alignment tolerances must be measured in nano-meters and nano-radians. Without a significant, well-supported research effort, including the development of new metrology techniques for use both on and off the beamline, these goals will likely not be met. The scant attention this issue has garnered is evident in the stretched budgets and limited manpower currently dedicated to metrology. With many of the world's leading groups represented at the workshop, it became clear that Japan and Europe are several steps ahead of the US in this critical area. But the situation isn't all dire: several leading groups are blazing a trail forward, and the recognition of this issue is increasing. The workshop featured eleven invited talks whose presenters came from Japan, Europe, and the US.« less

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

The extreme ultraviolet explorer archive

NASA Astrophysics Data System (ADS)

Polomski, E.; Drake, J. J.; Dobson, C.; Christian, C.

1993-09-01

The Extreme Ultrviolet Explorer (EUVE) public archive was created to handle the storage, maintenance, and distribution of EUVE data and ancillary documentation, information, and software. Access to the archive became available to the public on July 17, 1992, only 40 days after the launch of the EUVE satellite. A brief overview of the archive's contents and the various methods of access will be described.

EUV Coronal Waves: Atmospheric and Heliospheric Connections and Energetics

NASA Astrophysics Data System (ADS)

Patsourakos, S.

2015-12-01

Since their discovery in late 90's by EIT on SOHO, the study EUV coronal waves has been a fascinating andfrequently strongly debated research area. While it seems as ifan overall consensus has been reached about the nurture and nature of this phenomenon,there are still several important questions regarding EUV waves. By focusing on the most recentobservations, we will hereby present our current understanding about the nurture and nature of EUV waves,discuss their connections with other atmospheric and heliospheric phenomena (e.g.,flares and CMEs, Moreton waves, coronal shocks, coronal oscillations, SEP events) and finallyassess their possible energetic contribution to the overall budget of relatederuptive phenomena.

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)

NASA Astrophysics Data System (ADS)

Sitterly, Jacob; Murphy, Michael; Grzeskowiak, Steven; Denbeaux, Greg; Brainard, Robert L.

2018-03-01

This paper describes the photoreactivity of six organometallic complexes of the type PhnMX2 containing bismuth, antimony and tellurium, where n = 3 for bismuth and antimony and n = 2 for tellurium, and where X = acetate (O2CCH3) or pivalate (O2CC(CH3)3). These compounds were exposed to EUV light to monitor photodecomposition via in situ mass spectral analysis of the primary outgassing products of CO2, benzene and phenol. This paper explores the effect of metal center and carboxylate ligand on the EUV reactivity of these EUV photoresists.

Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chai, Kil-Byoung; Bellan, Paul M.

2013-12-15

An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

Registration performance on EUV masks using high-resolution registration metrology

NASA Astrophysics Data System (ADS)

Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

2016-10-01

Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

EUV tools: hydrogen gas purification and recovery strategies

NASA Astrophysics Data System (ADS)

Landoni, Cristian; Succi, Marco; Applegarth, Chuck; Riddle Vogt, Sarah

2015-03-01

The technological challenges that have been overcome to make extreme ultraviolet lithography (EUV) a reality have been enormous1. This vacuum driven technology poses significant purity challenges for the gases employed for purging and cleaning the scanner EUV chamber and source. Hydrogen, nitrogen, argon and ultra-high purity compressed dry air (UHPCDA) are the most common gases utilized at the scanner and source level. Purity requirements are tighter than for previous technology node tools. In addition, specifically for hydrogen, EUV tool users are facing not only gas purity challenges but also the need for safe disposal of the hydrogen at the tool outlet. Recovery, reuse or recycling strategies could mitigate the disposal process and reduce the overall tool cost of operation. This paper will review the types of purification technologies that are currently available to generate high purity hydrogen suitable for EUV applications. Advantages and disadvantages of each purification technology will be presented. Guidelines on how to select the most appropriate technology for each application and experimental conditions will be presented. A discussion of the most common approaches utilized at the facility level to operate EUV tools along with possible hydrogen recovery strategies will also be reported.

Optical element for full spectral purity from IR-generated EUV light sources

NASA Astrophysics Data System (ADS)

van den Boogaard, A. J. R.; Louis, E.; van Goor, F. A.; Bijkerk, F.

2009-03-01

Laser produced plasma (LLP) sources are generally considered attractive for high power EUV production in next generation lithography equipment. Such plasmas are most efficiently excited by the relatively long, infrared wavelengths of CO2-lasers, but a significant part of the rotational-vibrational excitation lines of the CO2 radiation will be backscattered by the plasma's critical density surface and consequently will be present as parasitic radiation in the spectrum of such sources. Since most optical elements in the EUV collecting and imaging train have a high reflection coefficient for IR radiation, undesirable heating phenomena at the resist level are likely to occur. In this study a completely new principle is employed to obtain full separation of EUV and IR radiation from the source by a single optical component. While the application of a transmission filter would come at the expense of EUV throughput, this technique potentially enables wavelength separation without loosing reflectance compared to a conventional Mo/Si multilayer coated element. As a result this method provides full spectral purity from the source without loss in EUV throughput. Detailed calculations on the principal of functioning are presented.

The EUV Helium Spectrum in the Quiet Sun: A By-Product of Coronal Emission?

NASA Technical Reports Server (NTRS)

Andretta, Vincenzo; DelZanna, Giulio; Jordan, Stuart D.; Oegerle, William (Technical Monitor)

2002-01-01

In this paper we test one of the mechanisms proposed to explain the intensities and other observed properties of the solar helium spectrum, and in particular of its Extreme-Ultraviolet (EUV) resonance lines. The so-called Photoionisation-Recombination (P-R) mechanism involves photoionisation of helium atoms and ions by EUV coronal radiation, followed by recombination cascades. We present calibrated measurements of EUV flux obtained with the two CDS spectrometers on board SOHO, in quiescent solar regions. We were able to obtain an essentially complete estimate of the total photoionizing flux in the wavelength range below 504 A (the photoionisation threshold for He(I)), as well as simultaneous measurements with the same instruments of the intensities of the strongest EUV helium lines: He(II) lambda304, He(I) lambda584, and He(I) lambda537. We find that there are not enough EUV photons to account for the observed helium line intensities. More specifically, we conclude that He(II) intensities cannot be explained by the P-R mechanism. Our results, however, leave open the possibility that the He(I) spectrum could be formed by the P-R mechanism, with the He(II) lambda304 line as a significant photoionizating source.

Investigation of the moving structures in a coronal bright point

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ning, Zongjun; Guo, Yang, E-mail: ningzongjun@pmo.ac.cn

2014-10-10

We have explored the moving structures in a coronal bright point (CBP) observed by the Solar Dynamic Observatory Atmospheric Imaging Assembly (AIA) on 2011 March 5. This CBP event has a lifetime of ∼20 minutes and is bright with a curved shape along a magnetic loop connecting a pair of negative and positive fields. AIA imaging observations show that a lot of bright structures are moving intermittently along the loop legs toward the two footpoints from the CBP brightness core. Such moving bright structures are clearly seen at AIA 304 Å. In order to analyze their features, the CBP ismore » cut along the motion direction with a curved slit which is wide enough to cover the bulk of the CBP. After integrating the flux along the slit width, we get the spacetime slices at nine AIA wavelengths. The oblique streaks starting from the edge of the CBP brightness core are identified as moving bright structures, especially on the derivative images of the brightness spacetime slices. They seem to originate from the same position near the loop top. We find that these oblique streaks are bi-directional, simultaneous, symmetrical, and periodic. The average speed is about 380 km s{sup –1}, and the period is typically between 80 and 100 s. Nonlinear force-free field extrapolation shows the possibility that magnetic reconnection takes place during the CBP, and our findings indicate that these moving bright structures could be the observational outflows after magnetic reconnection in the CBP.« less

Multi-Spectral Solar Telescope Array. II - Soft X-ray/EUV reflectivity of the multilayer mirrors

NASA Technical Reports Server (NTRS)

Barbee, Troy W., Jr.; Weed, J. W.; Hoover, Richard B.; Allen, Maxwell J.; Lindblom, Joakim F.; O'Neal, Ray H.; Kankelborg, Charles C.; Deforest, Craig E.; Paris, Elizabeth S.; Walker, Arthur B. C., Jr.

1991-01-01

The Multispectral Solar Telescope Array is a rocket-borne observatory which encompasses seven compact soft X-ray/EUV, multilayer-coated, and two compact far-UV, interference film-coated, Cassegrain and Ritchey-Chretien telescopes. Extensive measurements are presented on the efficiency and spectral bandpass of the X-ray/EUV telescopes. Attention is given to systematic errors and measurement errors.

Field-of-View Guiding Camera on the HISAKI (SPRINT-A) Satellite

NASA Astrophysics Data System (ADS)

Yamazaki, A.; Tsuchiya, F.; Sakanoi, T.; Uemizu, K.; Yoshioka, K.; Murakami, G.; Kagitani, M.; Kasaba, Y.; Yoshikawa, I.; Terada, N.; Kimura, T.; Sakai, S.; Nakaya, K.; Fukuda, S.; Sawai, S.

2014-11-01

HISAKI (SPRINT-A) satellite is an earth-orbiting Extreme UltraViolet (EUV) spectroscopic mission and launched on 14 Sep. 2013 by the launch vehicle Epsilon-1. Extreme ultraviolet spectroscope (EXCEED) onboard the satellite will investigate plasma dynamics in Jupiter's inner magnetosphere and atmospheric escape from Venus and Mars. EUV spectroscopy is useful to measure electron density and temperature and ion composition in plasma environment. EXCEED also has an advantage to measure spatial distribution of plasmas around the planets. To measure radial plasma distribution in the Jovian inner magnetosphere and plasma emissions from ionosphere, exosphere and tail separately (for Venus and Mars), the pointing accuracy of the spectroscope should be smaller than spatial structures of interest (20 arc-seconds). For satellites in the low earth orbit (LEO), the pointing displacement is generally caused by change of alignment between the satellite bus module and the telescope due to the changing thermal inputs from the Sun and Earth. The HISAKI satellite is designed to compensate the displacement by tracking the target with using a Field-Of-View (FOV) guiding camera. Initial checkout of the attitude control for the EXCEED observation shows that pointing accuracy kept within 2 arc-seconds in a case of "track mode" which is used for Jupiter observation. For observations of Mercury, Venus, Mars, and Saturn, the entire disk will be guided inside slit to observe plasma around the planets. Since the FOV camera does not capture the disk in this case, the satellite uses a star tracker (STT) to hold the attitude ("hold mode"). Pointing accuracy during this mode has been 20-25 arc-seconds. It has been confirmed that the attitude control works well as designed.

Mars Thermospheric Temperature Sensitivity to Solar EUV Forcing from the MAVEN EUV Monitor

NASA Astrophysics Data System (ADS)

Thiemann, Ed; Eparvier, Francis; Andersson, Laila; Pilinski, Marcin; Chamberlin, Phillip; Fowler, Christopher; MAVEN Extreme Ultraviolet Monitor Team, MAVEN Langmuir Probe and Waves Team

2017-10-01

Solar extreme ultraviolet (EUV) radiation is the primary heat source for the Mars thermosphere, and the primary source of long-term temperature variability. The Mars obliquity, dust cycle, tides and waves also drive thermospheric temperature variability; and it is important to quantify the role of each in order to understand processes in the upper atmosphere today and, ultimately, the evolution of Mars climate over time. Although EUV radiation is the dominant heating mechanism, accurately measuring the thermospheric temperature sensitivity to EUV forcing has remained elusive, in part, because Mars thermospheric temperature varies dramatically with latitude and local time (LT), ranging from 150K on the nightside to 300K on the dayside. It follows that studies of thermospheric variability must control for location.Instruments onboard the Mars Atmosphere and Volatile EvolutioN (MAVEN) orbiter have begun to characterize thermospheric temperature sensitivity to EUV forcing. Bougher et al. [2017] used measurements from the Imaging Ultraviolet Spectrograph (IUVS) and the Neutral Gas and Ion Mass Spectrometer (NGIMS) to characterize solar activity trends in the thermosphere with some success. However, aside from restricting measurements to solar zenith angles (SZAs) below 75 degrees, they were unable to control for latitude and LT because repeat-track observations from either instrument were limited or unavailable.The MAVEN EUV Monitor (EUVM) has recently demonstrated the capability to measure thermospheric density from 100 to 200 km with solar occultations of its 17-22 nm channel. These new density measurements are ideal for tracking the long-term thermospheric temperature variability because they are inherently constrained to either 06:00 or 18:00 LT, and the orbit has precessed to include a range of ecliptic latitudes, a number of which have been revisited multiple times over 2.5 years. In this study we present, for the first-time, measurements of thermospheric temperature sensitivity to EUV forcing derived from the EUVM measurements. These results include sensitives measured at the poles and near the equator for both terminators; therefore, we will also discuss the role of latitude on EUV temperature sensitivity.

Exploring dynamic events in the solar corona

NASA Astrophysics Data System (ADS)

Downs, Cooper James

With the advent of modern computational technology it is now becoming the norm to employ detailed 3D computer models as empirical tools that directly account for the inhomogeneous nature of the Sun-Heliosphere environment. The key advantage of this approach lies in the ability to compare model results directly to observational data and to use a successful comparison (or lack thereof) to glean information on the underlying physical processes. Using extreme ultraviolet waves (EUV waves) as the overarching scientific driver, we apply this observation modeling approach to study the complex dynamics of the magnetic and thermodynamic structures that are observed in the low solar corona. Representing a highly non-trivial effort, this work includes three main scientific thrusts: an initial modeling effort and two EUV wave case-studies. First we document the development of the new Low Corona (LC) model, a 3D time-dependent thermodynamic magnetohydrodynamic (MHD) model implemented within the Space Weather Modeling Framework (SWMF). Observation synthesis methods are integrated within the LC model, which provides the ability to compare model results directly to EUV imaging observations taken by spacecraft. The new model is then used to explore the dynamic interplay between magnetic structures and thermodynamic energy balance in the corona that is caused by coronal heating mechanisms. With the model development complete, we investigate the nature of EUV waves in detail through two case-studies. Starting with the 2008 March 25 event, we conduct a series of numerical simulations that independently vary fundamental parameters thought to govern the physical mechanisms behind EUV waves. Through the subsequent analysis of the 3D data and comparison to observations we find evidence for both wave and non-wave mechanisms contributing to the EUV wave signal. We conclude with a comprehensive observation and modeling analysis of the 2010 June 13 EUV wave event, which was observed by the recently launched Solar Dynamics Observatory. We use a high resolution simulation of the transient to unambiguously characterize the globally propagating front of EUV wave as a fast-mode magnetosonic wave, and use the rich set of observations to place the many other facets of the EUV transient within a unified scenario involving wave and non-wave components.

Increasing EUV source efficiency via recycling of radiation power

NASA Astrophysics Data System (ADS)

Hassanein, Ahmed; Sizyuk, Valeryi; Sizyuk, Tatyana; Johnson, Kenneth C.

2018-03-01

EUV source power is critical for advanced lithography, for achieving economical throughput performance and also for minimizing stochastic patterning effects. Power conversion efficiency can be increased by recycling plasma-scattered laser radiation and other out-of-band radiation back to the plasma via retroreflective optics. Radiation both within and outside of the collector light path can potentially be recycled. For recycling within the collector path, the system uses a diffractive collection mirror that concomitantly filters all laser and out-of-band radiation out of the EUV output. In this paper we review the optical design concept for power recycling and present preliminary plasma-physics simulation results showing a potential gain of 60% in EUV conversion efficiency.

Unidentified point sources in the IRAS minisurvey

NASA Technical Reports Server (NTRS)

Houck, J. R.; Soifer, B. T.; Neugebauer, G.; Beichman, C. A.; Aumann, H. H.; Clegg, P. E.; Gillett, F. C.; Habing, H. J.; Hauser, M. G.; Low, F. J.

1984-01-01

Nine bright, point-like 60 micron sources have been selected from the sample of 8709 sources in the IRAS minisurvey. These sources have no counterparts in a variety of catalogs of nonstellar objects. Four objects have no visible counterparts, while five have faint stellar objects visible in the error ellipse. These sources do not resemble objects previously known to be bright infrared sources.

Application of Laser Plasma Sources of Soft X-rays and Extreme Ultraviolet (EUV) in Imaging, Processing Materials and Photoionization Studies

NASA Astrophysics Data System (ADS)

Fiedorowicz, H.; Bartnik, A.; Wachulak, P. W.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Ahad, I. U.; Fok, T.; Szczurek, A.; Wȩgrzyński, Ł.

In the paper we present new applications of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) in various areas of plasma physics, nanotechnology and biomedical engineering. The sources are based on a gas puff target irradiated with nanosecond laser pulses from commercial Nd: YAG lasers, generating pulses with time duration from 1 to 10 ns and energies from 0.5 to 10 J at a 10 Hz repetition rate. The targets are produced with the use of a double valve system equipped with a special nozzle to form a double-stream gas puff target which allows for high conversion efficiency of laser energy into soft X-rays and EUV without degradation of the nozzle. The sources are equipped with various optical systems to collect soft X-ray and EUV radiation and form the radiation beam. New applications of these sources in imaging, including EUV tomography and soft X-ray microscopy, processing of materials and photoionization studies are presented.

Nanoimaging using soft X-ray and EUV laser-plasma sources

NASA Astrophysics Data System (ADS)

Wachulak, Przemyslaw; Torrisi, Alfio; Ayele, Mesfin; Bartnik, Andrzej; Czwartos, Joanna; Węgrzyński, Łukasz; Fok, Tomasz; Fiedorowicz, Henryk

2018-01-01

In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

Development of EUV mask handling technology at MIRAI-Selete

NASA Astrophysics Data System (ADS)

Ota, Kazuya; Amemiya, Mitsuaki; Taguchi, Takao; Kamono, Takashi; Kubo, Hiroyoshi; Takikawa, Tadahiko; Usui, Yoichi; Suga, Osamu

2007-03-01

We, MIRAI-Selete, started a new EUV mask program in April, 2006. Development of EUV mask handling technology is one of the key areas of the program. We plan to develop mask handling technology and to evaluate EUV mask carriers using Lasertec M3350, a particle inspection tool with the defect sensitivity less than 50nm PSL, and Mask Protection Engineering Tool (named "MPE Tool"). M3350 is a newly developed tool based on a conventional M1350 for EUV blanks inspection. Since our M3350 has a blank flipping mechanism in it, we can inspect the front and the back surface of the blank automatically. We plan to use the M3350 for evaluating particle adders during mask shipping, storage and handling. MPE Tool is a special tool exclusively developed for demonstration of pellicleless mask handling. It can handle a mask within a protective enclosure, which Canon and Nikon have been jointly proposing1, and also, can be modified to handle other type of carrier as the need arises.

EB and EUV lithography using inedible cellulose-based biomass resist material

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

2016-03-01

The validity of our approach of inedible cellulose-based resist material derived from woody biomass has been confirmed experimentally for the use of pure water in organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques of eco-conscious electron beam (EB) and extreme-ultraviolet (EUV) lithography. The water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB and EUV lithography was developed for environmental affair, safety, easiness of handling, and health of the working people. The inedible cellulose-based biomass resist material was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB and EUV sensitive groups. The 50-100 nm line and space width, and little footing profiles of cellulose-based biomass resist material on hardmask and layer were resolved at the doses of 10-30 μC/cm2. The eco-conscious lithography techniques was referred to as green EB and EUV lithography using inedible cellulose-based biomass resist material.

High performance EUV multilayer structures insensitive to capping layer optical parameters.

PubMed

Pelizzo, Maria Guglielmina; Suman, Michele; Monaco, Gianni; Nicolosi, Piergiorgio; Windt, David L

2008-09-15

We have designed and tested a-periodic multilayer structures containing protective capping layers in order to obtain improved stability with respect to any possible changes of the capping layer optical properties (due to oxidation and contamination, for example)-while simultaneously maximizing the EUV reflection efficiency for specific applications, and in particular for EUV lithography. Such coatings may be particularly useful in EUV lithographic apparatus, because they provide both high integrated photon flux and higher stability to the harsh operating environment, which can affect seriously the performance of the multilayer-coated projector system optics. In this work, an evolutive algorithm has been developed in order to design these a-periodic structures, which have been proven to have also the property of stable performance with respect to random layer thickness errors that might occur during coating deposition. Prototypes have been fabricated, and tested with EUV and X-ray reflectometry, and secondary electron spectroscopy. The experimental results clearly show improved performance of our new a-periodic coatings design compared with standard periodic multilayer structures.

Direct EUV/X-Ray Modulation of the Ionosphere During the August 2017 Total Solar Eclipse

NASA Astrophysics Data System (ADS)

Mrak, Sebastijan; Semeter, Joshua; Drob, Douglas; Huba, J. D.

2018-05-01

The great American total solar eclipse of 21 August 2017 offered a fortuitous opportunity to study the response of the atmosphere and ionosphere using a myriad of ground instruments. We have used the network of U.S. Global Positioning System receivers to examine perturbations in maps of ionospheric total electron content (TEC). Coherent large-scale variations in TEC have been interpreted by others as gravity wave-induced traveling ionospheric disturbances. However, the solar disk had two active regions at that time, one near the center of the disk and one at the edge, which resulted in an irregular illumination pattern in the extreme ultraviolet (EUV)/X-ray bands. Using detailed EUV occultation maps calculated from the National Aeronautics and Space Administration Solar Dynamics Observatory Atmospheric Imaging Assembly images, we show excellent agreement between TEC perturbations and computed gradients in EUV illumination. The results strongly suggest that prominent large-scale TEC disturbances were consequences of direct EUV modulation, rather than gravity wave-induced traveling ionospheric disturbances.

Normal incidence spectrophotometer using high density transmission grating technology and highly efficiency silicon photodiodes for absolute solar EUV irradiance measurements

NASA Technical Reports Server (NTRS)

Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Korde, R.

1992-01-01

New developments in transmission grating and photodiode technology now make it possible to realize spectrometers in the extreme ultraviolet (EUV) spectral region (wavelengths less than 1000 A) which are expected to be virtually constant in their diffraction and detector properties. Time dependent effects associated with reflection gratings are eliminated through the use of free standing transmission gratings. These gratings together with recently developed and highly stable EUV photodiodes have been utilized to construct a highly stable normal incidence spectrophotometer to monitor the variability and absolute intensity of the solar 304 A line. Owing to its low weight and compactness, such a spectrometer will be a valuable tool for providing absolute solar irradiance throughout the EUV. This novel instrument will also be useful for cross-calibrating other EUV flight instruments and will be flown on a series of Hitchhiker Shuttle Flights and on SOHO. A preliminary version of this instrument has been fabricated and characterized, and the results are described.

Pattern Inspection of EUV Masks Using DUV Light

NASA Astrophysics Data System (ADS)

Liang, Ted; Tejnil, Edita; Stivers, Alan R.

2002-12-01

Inspection of extreme ultraviolet (EUV) lithography masks requires reflected light and this poses special challenges for inspection tool suppliers as well as for mask makers. Inspection must detect all the printable defects in the absorber pattern as well as printable process-related defects. Progress has been made under the NIST ATP project on "Intelligent Mask Inspection Systems for Next Generation Lithography" in assessing the factors that impact the inspection tool sensitivity. We report in this paper the inspection of EUV masks with programmed absorber defects using 257nm light. All the materials of interests for masks are highly absorptive to EUV light as compared to deep ultraviolet (DUV) light. Residues and contamination from mask fabrication process and handling are prone to be printable. Therefore, it is critical to understand their EUV printability and optical inspectability. Process related defects may include residual buffer layer such as oxide, organic contaminants and possible over-etch to the multilayer surface. Both simulation and experimental results will be presented in this paper.

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mirkarimi, Paul B.; Bajt, Sasa; Wall, Mark A.

2000-04-01

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06-0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decreasemore » more steeply than Mo/Si for roughness values greater than approximately 0.2-0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar. (c) 2000 Optical Society of America.« less

Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.

PubMed

Mirkarimi, P B; Bajt, S; Wall, M A

2000-04-01

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06-0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decrease more steeply than Mo/Si for roughness values greater than approximately 0.2-0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar.

The extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Bowyer, Stuart; Malina, Roger F.

1990-01-01

The Extreme Ultraviolet Explorer (EUVE) mission, currently scheduled for launch in September 1991, is described. The primary purpose of the mission is to survey the celestial sphere for astronomical sources of Extreme Ultraviolet (EUV) radiation. The survey will be accomplished with the use of three EUV telescopes, each sensitive to a different segment of the EUV band. A fourth telescope will perform a high sensitivity search of a limited sample of the sky in the shortest wavelength bands. The all sky survey will be carried out in the first six months of the mission and will be made in four bands, or colors. The second phase of the mission, conducted entirely by guest observers selected by NASA, will be devoted to spectroscopic observations of EUV sources. The performance of the instrument components is described. An end to end model of the mission, from a stellar source to the resulting scientific data, was constructed. Hypothetical data from astronomical sources processed through this model are shown.

Optical inspection of NGL masks

NASA Astrophysics Data System (ADS)

Pettibone, Donald W.; Stokowski, Stanley E.

2004-12-01

For the last five years KLA-Tencor and our joint venture partners have pursued a research program studying the ability of optical inspection tools to meet the inspection needs of possible NGL lithographies. The NGL technologies that we have studied include SCALPEL, PREVAIL, EUV lithography, and Step and Flash Imprint Lithography. We will discuss the sensitivity of the inspection tools and mask design factors that affect tool sensitivity. Most of the work has been directed towards EUV mask inspection and how to optimize the mask to facilitate inspection. Our partners have succeeded in making high contrast EUV masks ranging in contrast from 70% to 98%. Die to die and die to database inspection of EUV masks have been achieved with a sensitivity that is comparable to what can be achieved with conventional photomasks, approximately 80nm defect sensitivity. We have inspected SCALPEL masks successfully. We have found a limitation of optical inspection when applied to PREVAIL stencil masks. We have run inspections on SFIL masks in die to die, reflected light, in an effort to provide feedback to improve the masks. We have used a UV inspection system to inspect both unpatterned EUV substrates (no coatings) and blanks (with EUV multilayer coatings). These inspection results have proven useful in driving down the substrate and blank defect levels.

EUVE/XTE orbit decay study

NASA Technical Reports Server (NTRS)

Richon, K.; Hashmall, J.; Lambertson, M.; Phillips, T.

1988-01-01

The Explorer Platform (EP) program currently comprises two missions, the Extreme Ultraviolet Explorer (EUVE) and the X-ray Timing Explorer (XTE), each of which consists of a scientific payload mounted to the EP. The EP has no orbit maintenance capability. The EP with the EUVE payload will be launched first. At the end of the EUVE mission, the spacecraft will be serviced by the Space Transportation System (STS), and the EUVE instrument will be exchanged for the XTE. The XTE mission will continue until reentry or reservicing by the STS. Because the missions will be using the EP sequentially, the orbit requirements are unusually constrained by orbit decay rates. The initial altitude must be selected so that, by the end of the EUVE mission (2.5 years), the spacecraft will have decayed to an altitude within the STS capabilities. In addition, the payload exchange must occur at an altitude that ensures meeting the minimum XTE mission lifetime (3 years) because no STS reboost will be available. Studies were performed using the Goddard Mission Analysis System to estimate the effects of mass, cross-sectional area, and solar flux on the fulfillment of mission requirements. In addition to results from these studies, conclusions are presented as to the accuracy of the Marshall Space Flight Center solar flux predictions.

Reconstruction of Solar EUV Flux 1740-2015

NASA Astrophysics Data System (ADS)

Svalgaard, L.

2015-12-01

Solar Extreme Ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo ionization of molecular Oxygen. Solar heating of the ionosphere creates thermal winds which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and sets with the Sun and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us the deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the 'Magnetic Crusade' of the 1830s and less reliable, but still usable, data are available for portions of the hundred years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F10.7 flux and the sunspot number, and find that the reconstructed EUV flux reproduces the F10.7 flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant 'solar magnetic ground state'.

Modeling of radiative properties of Sn plasmas for extreme-ultraviolet source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sasaki, Akira; Sunahara, Atsushi; Furukawa, Hiroyuki

Atomic processes in Sn plasmas are investigated for application to extreme-ultraviolet (EUV) light sources used in microlithography. We develop a full collisional radiative (CR) model of Sn plasmas based on calculated atomic data using Hebrew University Lawrence Livermore Atomic Code (HULLAC). Resonance and satellite lines from singly and multiply excited states of Sn ions, which contribute significantly to the EUV emission, are identified and included in the model through a systematic investigation of their effect on the emission spectra. The wavelengths of the 4d-4f+4p-4d transitions of Sn{sup 5+} to Sn{sup 13+} are investigated, because of their importance for determining themore » conversion efficiency of the EUV source, in conjunction with the effect of configuration interaction in the calculation of atomic structure. Calculated emission spectra are compared with those of charge exchange spectroscopy and of laser produced plasma EUV sources. The comparison is also carried out for the opacity of a radiatively heated Sn sample. A reasonable agreement is obtained between calculated and experimental EUV emission spectra observed under the typical condition of EUV sources with the ion density and ionization temperature of the plasma around 10{sup 18} cm{sup -3} and 20 eV, respectively, by applying a wavelength correction to the resonance and satellite lines. Finally, the spectral emissivity and opacity of Sn plasmas are calculated as a function of electron temperature and ion density. The results are useful for radiation hydrodynamics simulations for the optimization of EUV sources.« less

The extreme ultraviolet spectra of low-redshift radio-loud quasars

NASA Astrophysics Data System (ADS)

Punsly, Brian; Reynolds, Cormac; Marziani, Paola; O'Dea, Christopher P.

2016-07-01

This paper reports on the extreme ultraviolet (EUV) spectrum of three low-redshift (z ˜ 0.6) radio-loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph of the Hubble Space Telescope. The bolometric thermal emission, Lbol, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long-term time-averaged jet power, overline{Q}, for the three sources. overline{Q}/L_{bol}, is shown to lie along the correlation of overline{Q}/L_{bol}, and αEUV found in previous studies of the EUV continuum of intermediate and high-redshift quasars, where the EUV continuum flux density between 1100 and 700 Å is defined by F_{ν } ˜ ν ^{-α _{EUV}}. The high Eddington ratios of the three quasars extend the analysis into a wider parameter space. Selecting quasars with high Eddington ratios has accentuated the statistical significance of the partial correlation analysis of the data. Namely, the correlation of overline{Q}/L_{bol} and αEUV is fundamental, and the correlation of overline{Q} and αEUV is spurious at a very high statistical significance level (99.8 per cent). This supports the regulating role of ram pressure of the accretion flow in magnetically arrested accretion models of jet production. In the process of this study, we use multifrequency and multiresolution Very Large Array radio observations to determine that one of the bipolar jets in 3C 57 is likely frustrated by galactic gas that keeps the jet from propagating outside the host galaxy.

Extragalactic background light measurements and applications.

PubMed

Cooray, Asantha

2016-03-01

This review covers the measurements related to the extragalactic background light intensity from γ-rays to radio in the electromagnetic spectrum over 20 decades in wavelength. The cosmic microwave background (CMB) remains the best measured spectrum with an accuracy better than 1%. The measurements related to the cosmic optical background (COB), centred at 1 μm, are impacted by the large zodiacal light associated with interplanetary dust in the inner Solar System. The best measurements of COB come from an indirect technique involving γ-ray spectra of bright blazars with an absorption feature resulting from pair-production off of COB photons. The cosmic infrared background (CIB) peaking at around 100 μm established an energetically important background with an intensity comparable to the optical background. This discovery paved the way for large aperture far-infrared and sub-millimetre observations resulting in the discovery of dusty, starbursting galaxies. Their role in galaxy formation and evolution remains an active area of research in modern-day astrophysics. The extreme UV (EUV) background remains mostly unexplored and will be a challenge to measure due to the high Galactic background and absorption of extragalactic photons by the intergalactic medium at these EUV/soft X-ray energies. We also summarize our understanding of the spatial anisotropies and angular power spectra of intensity fluctuations. We motivate a precise direct measurement of the COB between 0.1 and 5 μm using a small aperture telescope observing either from the outer Solar System, at distances of 5 AU or more, or out of the ecliptic plane. Other future applications include improving our understanding of the background at TeV energies and spectral distortions of CMB and CIB.

Using synchrotron light to accelerate EUV resist and mask materials learning

NASA Astrophysics Data System (ADS)

Naulleau, Patrick; Anderson, Christopher N.; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Jones, Gideon; McClinton, Brittany; Miyakawa, Ryan; Mochi, Iacopo; Montgomery, Warren; Rekawa, Seno; Wallow, Tom

2011-03-01

As commercialization of extreme ultraviolet lithography (EUVL) progresses, direct industry activities are being focused on near term concerns. The question of long term extendibility of EUVL, however, remains crucial given the magnitude of the investments yet required to make EUVL a reality. Extendibility questions are best addressed using advanced research tools such as the SEMATECH Berkeley microfield exposure tool (MET) and actinic inspection tool (AIT). Utilizing Lawrence Berkeley National Laboratory's Advanced Light Source facility as the light source, these tools benefit from the unique properties of synchrotron light enabling research at nodes generations ahead of what is possible with commercial tools. The MET for example uses extremely bright undulator radiation to enable a lossless fully programmable coherence illuminator. Using such a system, resolution enhancing illuminations achieving k1 factors of 0.25 can readily be attained. Given the MET numerical aperture of 0.3, this translates to an ultimate resolution capability of 12 nm. Using such methods, the SEMATECH Berkeley MET has demonstrated resolution in resist to 16-nm half pitch and below in an imageable spin-on hard mask. At a half pitch of 16 nm, this material achieves a line-edge roughness of 2 nm with a correlation length of 6 nm. These new results demonstrate that the observed stall in ultimate resolution progress in chemically amplified resists is a materials issue rather than a tool limitation. With a resolution limit of 20-22 nm, the CAR champion from 2008 remains as the highest performing CAR tested to date. To enable continued advanced learning in EUV resists, SEMATECH has initiated a plan to implement a 0.5 NA microfield tool at the Advanced Light Source synchrotron facility. This tool will be capable of printing down to 8-nm half pitch.

Time-resolved Emission from Bright Hot Pixels of an Active Region Observed in the EUV Band with SDO/AIA and Multi-stranded Loop Modeling

NASA Astrophysics Data System (ADS)

Tajfirouze, E.; Reale, F.; Petralia, A.; Testa, P.

2016-01-01

Evidence of small amounts of very hot plasma has been found in active regions and might be an indication of impulsive heating released at spatial scales smaller than the cross-section of a single loop. We investigate the heating and substructure of coronal loops in the core of one such active region by analyzing the light curves in the smallest resolution elements of solar observations in two EUV channels (94 and 335 Å) from the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. We model the evolution of a bundle of strands heated by a storm of nanoflares by means of a hydrodynamic 0D loop model (EBTEL). The light curves obtained from a random combination of those of single strands are compared to the observed light curves either in a single pixel or in a row of pixels, simultaneously in the two channels, and using two independent methods: an artificial intelligent system (Probabilistic Neural Network) and a simple cross-correlation technique. We explore the space of the parameters to constrain the distribution of the heat pulses, their duration, their spatial size, and, as a feedback on the data, their signatures on the light curves. From both methods the best agreement is obtained for a relatively large population of events (1000) with a short duration (less than 1 minute) and a relatively shallow distribution (power law with index 1.5) in a limited energy range (1.5 decades). The feedback on the data indicates that bumps in the light curves, especially in the 94 Å channel, are signatures of a heating excess that occurred a few minutes before.

Extragalactic background light measurements and applications

PubMed Central

Cooray, Asantha

2016-01-01

This review covers the measurements related to the extragalactic background light intensity from γ-rays to radio in the electromagnetic spectrum over 20 decades in wavelength. The cosmic microwave background (CMB) remains the best measured spectrum with an accuracy better than 1%. The measurements related to the cosmic optical background (COB), centred at 1 μm, are impacted by the large zodiacal light associated with interplanetary dust in the inner Solar System. The best measurements of COB come from an indirect technique involving γ-ray spectra of bright blazars with an absorption feature resulting from pair-production off of COB photons. The cosmic infrared background (CIB) peaking at around 100 μm established an energetically important background with an intensity comparable to the optical background. This discovery paved the way for large aperture far-infrared and sub-millimetre observations resulting in the discovery of dusty, starbursting galaxies. Their role in galaxy formation and evolution remains an active area of research in modern-day astrophysics. The extreme UV (EUV) background remains mostly unexplored and will be a challenge to measure due to the high Galactic background and absorption of extragalactic photons by the intergalactic medium at these EUV/soft X-ray energies. We also summarize our understanding of the spatial anisotropies and angular power spectra of intensity fluctuations. We motivate a precise direct measurement of the COB between 0.1 and 5 μm using a small aperture telescope observing either from the outer Solar System, at distances of 5 AU or more, or out of the ecliptic plane. Other future applications include improving our understanding of the background at TeV energies and spectral distortions of CMB and CIB. PMID:27069645

The Triggering Mechanism of Quiet-Region Coronal Jet Eruptions: Flux Cancelation

NASA Technical Reports Server (NTRS)

Panesar, Navdeep K.; Sterling, Alphonse C.; Moore, Ronald L.

2017-01-01

Coronal jets are frequent transient features on the Sun, observed in EUV and X-ray emissions. They occur in active regions, quiet Sun and coronal holes, and appear as a bright spire with base brightenings. Recent studies show that many coronal jets are driven by the eruption of a minifilament. Here we investigate the magnetic cause of jet-driving minifilament eruptions. We study ten randomly-found on-disk quiet-region coronal jets using SDO/AIA intensity images and SDO/HMI magnetograms. For all ten events, we track the evolution of photospheric magnetic flux in the jet-base region in EUV images and find that (a) a cool (transition-region temperature) minifilament is present prior to each jet eruption; (b) the pre-eruption minifilament resides above the polarity-inversion line between majority-polarity and minority-polarity magnetic flux patches; (c) the opposite-polarity flux patches converge and cancel with each other; (d) the cancelation between the majority-polarity and minority-polarity flux patches eventually destabilizes the field holding the minifilament to erupt outwards; (e) the envelope of the erupting field barges into ambient oppositely-directed far-reaching field and undergoes external reconnection (interchange reconnection); (f) the external reconnection opens the envelope field and the minifilament field inside, allowing reconnected-heated hot material and cool minifilament material to escape along the far-reaching field, producing the jet spire. In summary, we found that each of our ten jets resulted from a minifilament eruption following flux cancelation at the magnetic neutral line under the pre-eruption minifilament. These observations show that flux cancelation is usually the trigger of quiet-region coronal jet eruptions.

Blob Formation and Ejection in Coronal Jets due to the Plasmoid and Kelvin–Helmholtz Instabilities

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ni, Lei; Lin, Jun; Zhang, Qing-Min

2017-05-20

We perform 2D resistive magnetohydrodynamic simulations of coronal jets driven by flux emergence along the lower boundary. The reconnection layers are susceptible to the formation of blobs that are ejected in the jet. Our simulation with low plasma β (Case I) shows that magnetic islands form easily and propagate upward in the jet. These islands are multithermal and thus are predicted to show up in hot channels (335 Å and 211 Å) and the cool channel (304 Å) in observations by the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory . The islands have maximum temperatures of 8 MK,more » lifetimes of 120 s, diameters of 6 Mm, and velocities of 200 km s{sup −1}. These parameters are similar to the properties of blobs observed in extreme-ultraviolet (EUV) jets by AIA. The Kelvin–Helmholtz instability develops in our simulation with moderately high plasma β (Case II) and leads to the formation of bright vortex-like blobs above the multiple high magnetosonic Mach number regions that appear along the jet. These vortex-like blobs can also be identified in the AIA channels. However, they eventually move downward and disappear after the high magnetosonic Mach number regions disappear. In the lower plasma β case, the lifetime for the jet is shorter, the jet and magnetic islands are formed with higher velocities and temperatures, the current-sheet fragments are more chaotic, and more magnetic islands are generated. Our results show that the plasmoid instability and Kelvin–Helmholtz instability along the jet are both possible causes of the formation of blobs observed at EUV wavelengths.« less

SEMATECH EUVL mask program status

NASA Astrophysics Data System (ADS)

Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

2009-04-01

As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been made but a continued collaborative effort will be needed along with timely infrastructure investments to meet these challenging goals.

It's Time For A New EUV Mission

NASA Astrophysics Data System (ADS)

Kowalski, Michael Paul; Wood, K. S.; Barstow, M. A.; Cruddace, R. G.

2010-01-01

The J-PEX high-resolution EUV spectrometer has made a breakthrough in capability with an effective area of 7 cm2 (220-245 Å) and resolving power of 4000, which exceed EUVE by factors of 7 and 20 respectively, and cover a range beyond the 170-Å cutoff of the Chandra LETG. The EUV includes critical spectral features containing diagnostic information often not available at other wavelengths (e.g., He II Ly series), and the bulk of radiation from million degree plasmas is emitted in the EUV. Such plasmas are ubiquitous, and examples include the atmospheres of white dwarfs; accretion phenomena in young stars, CVs and AGN; stellar coronae; and the ISM of our own galaxy and of others. However, sensitive EUV spectroscopy of high resolving power is required to resolve source spectral lines and edges unambiguously, to identify features produced by the intervening ISM, and to measure line profiles and Doppler shifts. This allows exploitation of the full range of plasma diagnostic techniques developed in laboratory and solar physics. J-PEX has flown twice on NASA sounding rockets. In 2001 we observed the isolated white dwarf G191-B2B and detected both ISM and photospheric lines. In 2008 we successfully observed the binary white dwarf Feige 24, but observation time is severely limited with sounding rockets. NASA has approved no new EUV mission, but it is time for one. Here we describe the scientific case for high-resolution EUV spectroscopy, summarize the technology that makes such measurements practical, and present a concept for a 3-month orbital mission, in which J-PEX is modified for a low-cost orbital mission to acquire sensitive high-resolution spectra for 30 white dwarfs, making an important contribution to the study of white dwarf evolution and hence the chemical balance of the Galaxy, and to the understanding of structure in the LISM.

RECONNECTION-DRIVEN CORONAL-HOLE JETS WITH GRAVITY AND SOLAR WIND

DOE Office of Scientific and Technical Information (OSTI.GOV)

Karpen, J. T.; DeVore, C. R.; Antiochos, S. K.

Coronal-hole jets occur ubiquitously in the Sun's coronal holes, at EUV and X-ray bright points associated with intrusions of minority magnetic polarity. The embedded-bipole model for these jets posits that they are driven by explosive, fast reconnection between the stressed closed field of the embedded bipole and the open field of the surrounding coronal hole. Previous numerical studies in Cartesian geometry, assuming uniform ambient magnetic field and plasma while neglecting gravity and solar wind, demonstrated that the model is robust and can produce jet-like events in simple configurations. We have extended these investigations by including spherical geometry, gravity, and solarmore » wind in a nonuniform, coronal hole-like ambient atmosphere. Our simulations confirm that the jet is initiated by the onset of a kink-like instability of the internal closed field, which induces a burst of reconnection between the closed and external open field, launching a helical jet. Our new results demonstrate that the jet propagation is sustained through the outer corona, in the form of a traveling nonlinear Alfvén wave front trailed by slower-moving plasma density enhancements that are compressed and accelerated by the wave. This finding agrees well with observations of white-light coronal-hole jets, and can explain microstreams and torsional Alfvén waves detected in situ in the solar wind. We also use our numerical results to deduce scaling relationships between properties of the coronal source region and the characteristics of the resulting jet, which can be tested against observations.« less

EUV and X-ray spectroheliograph study

NASA Technical Reports Server (NTRS)

Knox, E. D.; Pastor, R. A.; Salamon, A. L.; Sterk, A. A.

1975-01-01

The results of a program directed toward the definition of an EUV and X-ray spectroheliograph which has significant performance and operational improvements over the OSO-7 instrument are documented. The program investigated methods of implementing selected changes and incorporated the results of the study into a set of drawings which defines the new instrument. The EUV detector performance degradation observed during the OSO-7 mission was investigated and the most probable cause of the degradation identified.

Principal investigators data package for Project Initiation Conference (PIC): EUVS sounding rocket no. 36.117CL. Target: Venus

NASA Technical Reports Server (NTRS)

Stern, S. Alan

1993-01-01

The region of the UV between 500 and 1200 A is a rich one for the study of planetary and astrophysical targets. EUV atmospheric spectroscopy opens up an important window on ion and neutral nitrogen, oxygen, and noble gas emissions. In this document we describe the specific scientific background and motivations for this Venus EUV rocket observation along with experiment design and mission parameters.

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE PAGES

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.; ...

2018-02-05

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

NASA Astrophysics Data System (ADS)

Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

2010-09-01

In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

NASA Astrophysics Data System (ADS)

Hontake, Koichi; Huli, Lior; Lemley, Corey; Hetzer, Dave; Liu, Eric; Ko, Akiteru; Kawakami, Shinichiro; Shimoaoki, Takeshi; Hashimoto, Yusaku; Tanaka, Koichiro; Petrillo, Karen; Meli, Luciana; De Silva, Anuja; Xu, Yongan; Felix, Nelson; Johnson, Richard; Murray, Cody; Hubbard, Alex

2017-10-01

Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates under consideration for enabling the next generation of devices, for 7nm node and beyond. As the focus shifts to driving down the 'effective' k1 factor and enabling the full scaling entitlement of EUV patterning, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse, and eliminate film-related defects. In addition, CD uniformity and LWR/LER must be improved in terms of patterning performance. Tokyo Electron Limited (TEL™) and IBM Corporation are continuously developing manufacturing quality processes for EUV. In this paper, we review the ongoing progress in coater/developer based processes (coating, developing, baking) that are required to enable EUV patterning.

Ultra-low roughness magneto-rheological finishing for EUV mask substrates

NASA Astrophysics Data System (ADS)

Dumas, Paul; Jenkins, Richard; McFee, Chuck; Kadaksham, Arun J.; Balachandran, Dave K.; Teki, Ranganath

2013-09-01

EUV mask substrates, made of titania-doped fused silica, ideally require sub-Angstrom surface roughness, sub-30 nm flatness, and no bumps/pits larger than 1 nm in height/depth. To achieve the above specifications, substrates must undergo iterative global and local polishing processes. Magnetorheological finishing (MRF) is a local polishing technique which can accurately and deterministically correct substrate figure, but typically results in a higher surface roughness than the current requirements for EUV substrates. We describe a new super-fine MRF® polishing fluid whichis able to meet both flatness and roughness specifications for EUV mask blanks. This eases the burden on the subsequent global polishing process by decreasing the polishing time, and hence the defectivity and extent of figure distortion.

Thin film filter lifetesting results in the extreme ultraviolet

NASA Technical Reports Server (NTRS)

Vedder, P. W.; Vallerga, J. V.; Gibson, J. L.; Stock, J.; Siegmund, O. H. W.

1993-01-01

We present the results of the thin film filter lifetesting program conducted as part of the NASA Extreme Ultraviolet Explorer (EUVE) satellite mission. This lifetesting program is designed to monitor changes in the transmission and mechanical properties of the EUVE filters over the lifetime of the mission (fabrication, assembly, launch and operation). Witness test filters were fabricated from thin film foils identical to those used in the flight filters. The witness filters have been examined and calibrated periodically over the past seven years. The filters have been examined for evidence of pinholing, mechanical degradation, and oxidation. Absolute transmissions of the flight and witness filters have been measured in the extreme ultraviolet (EUV) over six orders of magnitude at numerous wavelengths using the Berkeley EUV Calibration Facility.

Solar EUV irradiance from the San Marco ASSI - A reference spectrum

NASA Technical Reports Server (NTRS)

Schmidtke, Gerhard; Woods, Thomas N.; Worden, John; Rottman, Gary J.; Doll, Harry; Wita, Claus; Solomon, Stanley C.

1992-01-01

The only satellite measurement of the solar EUV irradiance during solar cycle 22 has been obtained with the Airglow Solar Spectrometer Instrument (ASSI) aboard the San Marco 5 satellite flown in 1988. The ASSI in-flight calibration parameters are established by using the internal capabilities of ASSI and by comparing ASSI results to the results from other space-based experiments on the ASSI calibration rocket and the Solar Mesospheric Explorer (SME). A solar EUV irradiance spectrum derived from ASSI observations on November 10, 1988 is presented as a reference spectrum for moderate solar activity for the aeronomy community. This ASSI spectrum should be considered as a refinement and extension of the solar EUV spectrum published for the same day by Woods and Rottman (1990).

Ultimate patterning limits for EUV at 5nm node and beyond

NASA Astrophysics Data System (ADS)

Ali, Rehab Kotb; Hamed Fatehy, Ahmed; Lafferty, Neal; Word, James

2018-03-01

The 5nm technology node introduces more aggressive geometries than previous nodes. In this paper, we are introducing a comprehensive study to examine the pattering limits of EUV at 0.33NA. The study is divided into two main approaches: (A) Exploring pattering limits of Single Exposure EUV Cut/Block mask in Self-Aligned-Multi-Patterning (SAMP) process, and (B) Exploring the pattering limits of a Single Exposure EUV printing of metal Layers. The printability of the resulted OPC masks is checked through a model based manufacturing flow for the two pattering approaches. The final manufactured patterns are quantified by Edge Placement Error (EPE), Process Variation Band (PVBand), soft/hard bridging and pinching, Image Log Slope (ILS) and Common Depth of Focus (CDOF)

Mask-induced aberration in EUV lithography

NASA Astrophysics Data System (ADS)

Nakajima, Yumi; Sato, Takashi; Inanami, Ryoichi; Nakasugi, Tetsuro; Higashiki, Tatsuhiko

2009-04-01

We estimated aberrations using Zernike sensitivity analysis. We found the difference of the tolerated aberration with line direction for illumination. The tolerated aberration of perpendicular line for illumination is much smaller than that of parallel line. We consider this difference to be attributable to the mask 3D effect. We call it mask-induced aberration. In the case of the perpendicular line for illumination, there was a difference in CD between right line and left line without aberration. In this report, we discuss the possibility of pattern formation in NA 0.25 generation EUV lithography tool. In perpendicular pattern for EUV light, the dominant part of aberration is mask-induced aberration. In EUV lithography, pattern correction based on the mask topography effect will be more important.

Integrated approach to improving local CD uniformity in EUV patterning

NASA Astrophysics Data System (ADS)

Liang, Andrew; Hermans, Jan; Tran, Timothy; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Dusa, Mircea; Singhal, Akhil; van Schravendijk, Bart; Dixit, Girish; Shamma, Nader

2017-03-01

Extreme ultraviolet (EUV) lithography is crucial to enabling technology scaling in pitch and critical dimension (CD). Currently, one of the key challenges of introducing EUV lithography to high volume manufacturing (HVM) is throughput, which requires high source power and high sensitivity chemically amplified photoresists. Important limiters of high sensitivity chemically amplified resists (CAR) are the effects of photon shot noise and resist blur on the number of photons received and of photoacids generated per feature, especially at the pitches required for 7 nm and 5 nm advanced technology nodes. These stochastic effects are reflected in via structures as hole-to-hole CD variation or local CD uniformity (LCDU). Here, we demonstrate a synergy of film stack deposition, EUV lithography, and plasma etch techniques to improve LCDU, which allows the use of high sensitivity resists required for the introduction of EUV HVM. Thus, to improve LCDU to a level required by 5 nm node and beyond, film stack deposition, EUV lithography, and plasma etch processes were combined and co-optimized to enhance LCDU reduction from synergies. Test wafers were created by depositing a pattern transfer stack on a substrate representative of a 5 nm node target layer. The pattern transfer stack consisted of an atomically smooth adhesion layer and two hardmasks and was deposited using the Lam VECTOR PECVD product family. These layers were designed to mitigate hole roughness, absorb out-of-band radiation, and provide additional outlets for etch to improve LCDU and control hole CD. These wafers were then exposed through an ASML NXE3350B EUV scanner using a variety of advanced positive tone EUV CAR. They were finally etched to the target substrate using Lam Flex dielectric etch and Kiyo conductor etch systems. Metrology methodologies to assess dimensional metrics as well as chip performance and defectivity were investigated to enable repeatable patterning process development. Illumination conditions in EUV lithography were optimized to improve normalized image log slope (NILS), which is expected to reduce shot noise related effects. It can be seen that the EUV imaging contrast improvement can further reduce post-develop LCDU from 4.1 nm to 3.9 nm and from 2.8 nm to 2.6 nm. In parallel, etch processes were developed to further reduce LCDU, to control CD, and to transfer these improvements into the final target substrate. We also demonstrate that increasing post-develop CD through dose adjustment can enhance the LCDU reduction from etch. Similar trends were also observed in different pitches down to 40 nm. The solutions demonstrated here are critical to the introduction of EUV lithography in high volume manufacturing. It can be seen that through a synergistic deposition, lithography, and etch optimization, LCDU at a 40 nm pitch can be improved to 1.6 nm (3-sigma) in a target oxide layer and to 1.4 nm (3-sigma) at the photoresist layer.

Novel EUV mask black border suppressing EUV and DUV OoB light reflection

NASA Astrophysics Data System (ADS)

Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-05-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (<0.05%) have been proposed; such an image border is referred to as a black border. In particular, an etched multilayer type black border was developed; it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change in the die influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light from the EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel BB called `Hybrid Black Border' (HBB) has been developed to eliminate EUV and DUV OOB light reflection by applying optical design technique and special micro-fabrication technique. A new test mask with HBB is fabricated without any degradation of mask quality according to the result of CD performance in the main pattern, defectivity and cleaning durability. The imaging performance for N10 imaging structures is demonstrated on NXE:3300B in collaboration with ASML. This result is compared to the imaging results obtained for a mask with the earlier developed BB, and HBB has achieved ~3x improvement; less than 0.2 nm CD changes are observed in the corners of the die. A CD uniformity budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Characterization and control of EUV scanner dose uniformity and stability

NASA Astrophysics Data System (ADS)

Robinson, Chris; Corliss, Dan; Meli, Luciana; Johnson, Rick

2018-03-01

The EUV source is an impressive feat of engineering that provides 13.5 nm radiation by vaporizing tin droplets with a high power CO2 laser and focusing the photons produced in the resultant plasma into the scanner illumination system. Great strides have been made in addressing the many potential stability challenges, but there are still residual spatial and temporal dose non-uniformity signatures. Since even small dose errors can impact the yieldable process window for the advanced lithography products that are exposed on EUV scanners it is crucial to monitor and control the dose variability. Using on-board metrology, the EUV scanner outputs valuable metrics that provide real time insight into the dose performance. We have supplemented scanner data collection with a wafer based methodology that provides high throughput, high sensitivity, quantitative characterization of the EUV scanner dose delivery. The technique uses open frame EUV exposures, so it is exclusive of lithographic pattern imaging, exclusive of lithographic mask pattern and not limited by placement of metrology features. Processed wafers are inspected rapidly, providing 20,000 pixels of detail per exposure field in approximately one minute. Exposing the wafer on the scanner with a bit less than the resist E0 (open frame clearing dose) results in good sensitivity to small variations in the EUV dose delivered. The nominal exposure dose can be modulated by field to calibrate the inspection results and provide quantitative assessment of variations with < 1% sensitivity. This technique has been used for dose uniformity assessments. It is also being used for long term dose stability monitoring and has proven valuable for short term dose stability follow up investigations.

THE INFLUENCE OF THE EXTREME ULTRAVIOLET SPECTRAL ENERGY DISTRIBUTION ON THE STRUCTURE AND COMPOSITION OF THE UPPER ATMOSPHERE OF EXOPLANETS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo, J. H.; Ben-Jaffel, Lotfi, E-mail: guojh@ynao.ac.cn, E-mail: bjaffel@iap.fr

2016-02-20

By varying the profiles of stellar extreme ultraviolet (EUV) spectral energy distributions (SEDs), we tested the influences of stellar EUV SEDs on the physical and chemical properties of an escaping atmosphere. We apply our model to study four exoplanets: HD 189733b, HD 209458b, GJ 436b, and Kepler-11b. We find that the total mass loss rates of an exoplanet, which are determined mainly by the integrated fluxes, are moderately affected by the profiles of the EUV SED, but the composition and species distributions in the atmosphere can be dramatically modified by the different profiles of the EUV SED. For exoplanets withmore » a high hydrodynamic escape parameter (λ), the amount of atomic hydrogen produced by photoionization at different altitudes can vary by one to two orders of magnitude with the variation of stellar EUV SEDs. The effect of photoionization of H is prominent when the EUV SED is dominated by the low-energy spectral region (400–900 Å), which pushes the transition of H/H{sup +} to low altitudes. In contrast, the transition of H/H{sup +} moves to higher altitudes when most photons are concentrated in the high-energy spectral region (50–400 Å). For exoplanets with a low λ, the lower temperatures of the atmosphere make many chemical reactions so important that photoionization alone can no longer determine the composition of the escaping atmosphere. For HD 189733b, it is possible to explain the time variability of Lyα between 2010 and 2011 by a change in the EUV SED of the host K-type star, yet invoking only thermal H i in the atmosphere.« less

CME Expansion as the Driver of Metric Type II Shock Emission as Revealed by Self-consistent Analysis of High-Cadence EUV Images and Radio Spectrograms

NASA Astrophysics Data System (ADS)

Kouloumvakos, A.; Patsourakos, S.; Hillaris, A.; Vourlidas, A.; Preka-Papadema, P.; Moussas, X.; Caroubalos, C.; Tsitsipis, P.; Kontogeorgos, A.

2014-06-01

On 13 June 2010, an eruptive event occurred near the solar limb. It included a small filament eruption and the onset of a relatively narrow coronal mass ejection (CME) surrounded by an extreme ultraviolet (EUV) wave front recorded by the Solar Dynamics Observatory's (SDO) Atmospheric Imaging Assembly (AIA) at high cadence. The ejection was accompanied by a GOES M1.0 soft X-ray flare and a Type-II radio burst; high-resolution dynamic spectra of the latter were obtained by the Appareil de Routine pour le Traitement et l'Enregistrement Magnetique de l'Information Spectral (ARTEMIS IV) radio spectrograph. The combined observations enabled a study of the evolution of the ejecta and the EUV wave front and its relationship with the coronal shock manifesting itself as metric Type-II burst. By introducing a novel technique, which deduces a proxy of the EUV compression ratio from AIA imaging data and compares it with the compression ratio deduced from the band-split of the Type-II metric radio burst, we are able to infer the potential source locations of the radio emission of the shock on that AIA images. Our results indicate that the expansion of the CME ejecta is the source for both EUV and radio shock emissions. Early in the CME expansion phase, the Type-II burst seems to originate in the sheath region between the EUV bubble and the EUV shock front in both radial and lateral directions. This suggests that both the nose and the flanks of the expanding bubble could have driven the shock.

Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Rajyaguru, Chirag; Koga, Masato; Kawasaki, Keita; Sasaki, Wataru; Kubodera, Shoichi; Kikuchi, Takashi; Yugami, Noboru; Kawata, Shigeo; Andreev, Alexander A.

2005-03-01

Extreme ultraviolet (EUV) radiation at the wavelength of around 13nm waws observed from a laser-produced plasma using continuous water-jet. Strong dependence of the conversion efficiency (CE) on the laser focal spot size and jet diameter was observed. The EUV CE at a given laser spot size and jet diameter was further enhanced using double laser pulses, where a pre-pulse was used for initial heating of the plasma.

Extreme ultraviolet spectroscopy of low pressure helium microwave driven discharges

NASA Astrophysics Data System (ADS)

Espinho, Susana; Felizardo, Edgar; Tatarova, Elena; Alves, Luis Lemos

2016-09-01

Surface wave driven discharges are reliable plasma sources that can produce high levels of vacuum and extreme ultraviolet radiation (VUV and EUV). The richness of the emission spectrum makes this type of discharge a possible alternative source in EUV/VUV radiation assisted applications. However, due to challenging experimental requirements, publications concerning EUV radiation emitted by microwave plasmas are scarce and a deeper understanding of the main mechanisms governing the emission of radiation in this spectral range is required. To this end, the EUV radiation emitted by helium microwave driven plasmas operating at 2.45 GHz has been studied for low pressure conditions. Spectral lines from excited helium atoms and ions were detected via emission spectroscopy in the EUV/VUV regions. Novel data concerning the spectral lines observed in the 23 - 33 nm wavelength range and their intensity behaviour with variation of the discharge operational conditions are presented. The intensity of all the spectral emissions strongly increases with the microwave power delivered to the plasma up to 400 W. Furthermore, the intensity of all the ion spectral emissions in the EUV range decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar. Work funded by FCT - Fundacao para a Ciencia e a Tecnologia, under Project UID/FIS/50010/2013 and grant SFRH/BD/52412/2013 (PD-F APPLAuSE).

Recent solar extreme ultraviolet irradiance observations and modeling: A review

NASA Technical Reports Server (NTRS)

Tobiska, W. Kent

1993-01-01

For more than 90 years, solar extreme ultraviolet (EUV) irradiance modeling has progressed from empirical blackbody radiation formulations, through fudge factors, to typically measured irradiances and reference spectra was well as time-dependent empirical models representing continua and line emissions. A summary of recent EUV measurements by five rockets and three satellites during the 1980s is presented along with the major modeling efforts. The most significant reference spectra are reviewed and threee independently derived empirical models are described. These include Hinteregger's 1981 SERF1, Nusinov's 1984 two-component, and Tobiska's 1990/1991/SERF2/EUV91 flux models. They each provide daily full-disk broad spectrum flux values from 2 to 105 nm at 1 AU. All the models depend to one degree or another on the long time series of the Atmosphere Explorer E (AE-E) EUV database. Each model uses ground- and/or space-based proxies to create emissions from solar atmospheric regions. Future challenges in EUV modeling are summarized including the basic requirements of models, the task of incorporating new observations and theory into the models, the task of comparing models with solar-terrestrial data sets, and long-term goals and modeling objectives. By the late 1990s, empirical models will potentially be improved through the use of proposed solar EUV irradiance measurements and images at selected wavelengths that will greatly enhance modeling and predictive capabilities.

Distinct EUV minimum of the solar irradiance (16-40 nm) observed by SolACES spectrometers onboard the International Space Station (ISS) in August/September 2009

NASA Astrophysics Data System (ADS)

Nikutowski, B.; Brunner, R.; Erhardt, Ch.; Knecht, St.; Schmidtke, G.

2011-09-01

In the field of terrestrial climatology the continuous monitoring of the solar irradiance with highest possible accuracy is an important goal. SolACES as a part of the ESA mission SOLAR on the ISS is measuring the short-wavelength solar EUV irradiance from 16-150 nm. This data will be made available to the scientific community to investigate the impact of the solar irradiance variability on the Earth's climate as well as the thermospheric/ionospheric interactions that are pursued in the TIGER program. Since the successful launch with the shuttle mission STS-122 on February 7th, 2008, SolACES initially recorded the low EUV irradiance during the extended solar activity minimum. Thereafter it has been observing the EUV irradiance during the increasing solar activity with enhanced intensity and changing spectral composition. SolACES consists of three grazing incidence planar grating spectrometers. In addition there are two three-signal ionisation chambers, each with exchangeable band-pass filters to determine the absolute EUV fluxes repeatedly during the mission. One important problem of space-borne instrumentation recording the solar EUV irradiance is the degradation of the spectrometer sensitivity. The two double ionisation chambers of SolACES, which could be re-filled with three different gases for each recording, allow the recalibration of the efficiencies of the three SolACES spectrometers from time to time.

Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

NASA Astrophysics Data System (ADS)

Madey, Theodore E.; Faradzhev, Nadir S.; Yakshinskiy, Boris V.; Edwards, N. V.

2006-12-01

One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ∼2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.

An investigation of solar erythemal ultraviolet radiation at two sites in tourist attraction areas of Thailand

NASA Astrophysics Data System (ADS)

Buntoung, Sumaman; Pattarapanitchai, Somjet; Wattan, Rungrat; Masiri, Itsara; Promsen, Worrapass; Tohsing, Korntip; Janjai, Serm

2013-05-01

Islands on the southern coasts of Thailand are famous attractions for local and foreign tourists. Tourists usually expose their skins to solar radiation for tanning. Thus information on solar ultraviolet radiation (UV) is of importance for tourists to protect themselves from adverse effects of UV. In this work, solar erythemal ultraviolet radiation (EUV) at two touristic sites namely Samui island (9.451°N, 100.033°E) and Phuket island (8.104°N, 98.304°E) was investigated. In investigating EUV, broadband UV radiometers (Kipp & Zonen, model UVS-B-C) were installed at existing meteorological stations in Samui and Phuket islands. A one-year period of EUV data from these two sites was analyzed. The level of UV index at these sites was studied. The values of UV index higher than 12 at noon time of clear days are usually found in the summer at both sites. Seasonal variation of EUV at both sites was investigated. It was found that the tropical monsoons have strong influence on this variation. Finally, global broadband radiation measured at the sites was also used to establish a correlation between EUV and global broadband radiation. Higher correlation was found for the case of clear sky, as compared to the case of cloudy sky. The correlation obtained from this analysis can be used to estimate EUV from global broadband radiation at these two sites.

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

NASA Astrophysics Data System (ADS)

Bartnik, A.

2015-06-01

In this work a review of investigations concerning interaction of intense extreme ultraviolet (EUV) and soft X-ray (SXR) pulses with matter is presented. The investigations were performed using laser-produced plasma (LPP) EUV/SXR sources based on a double stream gas puff target. The sources are equipped with dedicated collectors allowing for efficient focusing of the EUV/SXR radiation pulses. Intense radiation in a wide spectral range, as well as a quasi-monochromatic radiation can be produced. In the paper different kinds of LPP EUV/SXR sources developed in the Institute of Optoelectronics, Military University of Technology are described. Radiation intensities delivered by the sources are sufficient for different kinds of interaction experiments including EUV/SXR induced ablation, surface treatment, EUV fluorescence or photoionized plasma creation. A brief review of the main results concerning this kind of experiments performed by author of the paper are presented. However, since the LPP sources cannot compete with large scale X-ray sources like synchrotrons, free electron lasers or high energy density plasma sources, it was indicated that some investigations not requiring extreme irradiation parameters can be performed using the small scale installations. Some results, especially concerning low temperature photoionized plasmas are very unique and could be hardly obtained using the large facilities.

Coronal ``Wave'': Magnetic Footprint of a Coronal Mass Ejection?

NASA Astrophysics Data System (ADS)

Attrill, Gemma D. R.; Harra, Louise K.; van Driel-Gesztelyi, Lidia; Démoulin, Pascal

2007-02-01

We investigate the properties of two ``classical'' EUV Imaging Telescope (EIT) coronal waves. The two source regions of the associated coronal mass ejections (CMEs) possess opposite helicities, and the coronal waves display rotations in opposite senses. We observe deep core dimmings near the flare site and also widespread diffuse dimming, accompanying the expansion of the EIT wave. We also report a new property of these EIT waves, namely, that they display dual brightenings: persistent ones at the outermost edge of the core dimming regions and simultaneously diffuse brightenings constituting the leading edge of the coronal wave, surrounding the expanding diffuse dimmings. We show that such behavior is consistent with a diffuse EIT wave being the magnetic footprint of a CME. We propose a new mechanism where driven magnetic reconnections between the skirt of the expanding CME magnetic field and quiet-Sun magnetic loops generate the observed bright diffuse front. The dual brightenings and the widespread diffuse dimming are identified as innate characteristics of this process.

Detection of significant differences between absorption spectra of neutral helium and low temperature photoionized helium plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.

2013-11-15

In this work, spectral investigations of photoionized He plasmas were performed. The photoionized plasmas were created by irradiation of helium stream, with intense pulses from laser-plasma extreme ultraviolet (EUV) source. The EUV source was based on a double-stream Xe/Ne gas-puff target irradiated with 10 ns/10 J Nd:YAG laser pulses. The most intense emission from the source spanned a relatively narrow spectral region below 20 nm, however, spectrally integrated intensity at longer wavelengths was also significant. The EUV radiation was focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulse. The long-wavelength part of the EUVmore » radiation was used for backlighting of the photoionized plasmas to obtain absorption spectra. Both emission and absorption spectra in the EUV range were investigated. Significant differences between absorption spectra acquired for neutral helium and low temperature photoionized plasmas were demonstrated for the first time. Strong increase of intensities and spectral widths of absorption lines, together with a red shift of the K-edge, was shown.« less

Relationship between hard X-ray and EUV sources in solar flares

NASA Technical Reports Server (NTRS)

Kane, S. R.; Frost, K. J.; Donnelly, R. F.

1979-01-01

The high time resolution hard X-ray (not less than 15 keV) observations of medium and large impulsive solar flares made with the OSO 5 satellite are compared with the simultaneous ground-based observations of 10-1030 A EUV flux made via sudden frequency deviations (SFD) at Boulder. For most flares the agreement between the times of maxima of the impulsive hard X-ray and EUV emissions is found to be consistent with earlier studies (not less than 1 s). The rise and decay times of the EUV emission are larger than the corresponding times for X-rays not less than 30 keV. When OSO 5 hard X-ray measurements are combined with those made by OGO1, OGO 3, OGO 5, and TD 1A satellites, it is found that there is a nearly linear relationship between the energy fluxes of impulsive EUV emission and X-rays not less than 10 keV over a wide range of flare magnitudes. A model involving only a 'partial precipitation' of energetic electrons and consisting of both thick and thin target hard X-ray sources is examined.

Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

PubMed Central

Makhotkin, Igor A.; Sobierajski, Ryszard; Chalupský, Jaromir; Tiedtke, Kai; de Vries, Gosse; Störmer, Michael; Scholze, Frank; Siewert, Frank; van de Kruijs, Robbert W. E.; Milov, Igor; Louis, Eric; Jacyna, Iwanna; Jurek, Marek; Klinger, Dorota; Syryanyy, Yevgen; Juha, Libor; Hájková, Věra; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Toleikis, Sven; Loch, Rolf; Hermann, Martin; Strobel, Sebastian; Nienhuys, Han-Kwang; Gwalt, Grzegorz; Mey, Tobias; Enkisch, Hartmut

2018-01-01

The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface. PMID:29271755

Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.

PubMed

Makhotkin, Igor A; Sobierajski, Ryszard; Chalupský, Jaromir; Tiedtke, Kai; de Vries, Gosse; Störmer, Michael; Scholze, Frank; Siewert, Frank; van de Kruijs, Robbert W E; Milov, Igor; Louis, Eric; Jacyna, Iwanna; Jurek, Marek; Klinger, Dorota; Nittler, Laurent; Syryanyy, Yevgen; Juha, Libor; Hájková, Věra; Vozda, Vojtěch; Burian, Tomáš; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Schreiber, Siegfried; Toleikis, Sven; Loch, Rolf; Hermann, Martin; Strobel, Sebastian; Nienhuys, Han Kwang; Gwalt, Grzegorz; Mey, Tobias; Enkisch, Hartmut

2018-01-01

The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.

Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source

NASA Astrophysics Data System (ADS)

Inoue, T.; Nica, P. E.; Kaku, K.; Shimoura, A.; Amano, S.; Miyamoto, S.; Mochizuki, T.

2006-03-01

In this paper, characterizations of a cryogenic Xe capillary jet target for a laser-produced plasma extreme ultraviolet (EUV) light source are reported. The capillary jet target is a candidate of fast-supplying targets for mitigating debris generation and target consumption in a vacuum chamber without reducing the EUV conversion efficiency. Xe capillary jets (jet velocity ~ 0.4 m/s) were generated in vacuum by using annular nozzles chilled to ~ 170 K at a Xe backing pressure of ~ 0.7 MPa. Forming mechanisms of the capillary jet targets were studied by using numerical calculations. Furthermore, laser-produced plasma EUV generation was performed by irradiating a Nd:YAG laser (1064 nm, ~ 0.5 J, 10 ns, 120 μmφ, ~ 4×10 11 W/cm2) on a Xe capillary jet target (outer / inner diameter = 100 / 70 μmφ). The angular distribution of EUV generation was approximately uniform around the Xe capillary jet target, and the peak kinetic energy of the fast-ions was evaluated to be ~ 2 keV.

Understanding and reduction of defects on finished EUV masks

NASA Astrophysics Data System (ADS)

Liang, Ted; Sanchez, Peter; Zhang, Guojing; Shu, Emily; Nagpal, Rajesh; Stivers, Alan

2005-05-01

To reduce the risk of EUV lithography adaptation for the 32nm technology node in 2009, Intel has operated a EUV mask Pilot Line since early 2004. The Pilot Line integrates all the necessary process modules including common tool sets shared with current photomask production as well as EUV specific tools. This integrated endeavor ensures a comprehensive understanding of any issues, and development of solutions for the eventual fabrication of defect-free EUV masks. Two enabling modules for "defect-free" masks are pattern inspection and repair, which have been integrated into the Pilot Line. This is the first time we are able to look at real defects originated from multilayer blanks and patterning process on finished masks over entire mask area. In this paper, we describe our efforts in the qualification of DUV pattern inspection and electron beam mask repair tools for Pilot Line operation, including inspection tool sensitivity, defect classification and characterization, and defect repair. We will discuss the origins of each of the five classes of defects as seen by DUV pattern inspection tool on finished masks, and present solutions of eliminating and mitigating them.

EUV multilayer coatings for the Atmospheric Imaging Assembly instrument aboard the Solar Dynamics Observatory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Soufli, R; Windt, D L; Robinson, J C

2006-02-09

Multilayer coatings for the 7 EUV channels of the AIA have been developed and completed successfully on all AIA flight mirrors. Mo/Si coatings (131, 171, 193.5, 211 {angstrom}) were deposited at Lawrence Livermore National Laboratory (LLNL). Mg/SiC (304, 335 {angstrom}) and Mo/Y (94 {angstrom}) coatings were deposited at Columbia University. EUV reflectance of the 131/335 {angstrom}, 171 {angstrom}, 193.5/211 {angstrom} primary and secondary flight mirrors and the 94/304 {angstrom} secondary flight mirror was measured at beamline 6.3.2. of the Advanced Light Source (ALS) at LBNL. EUV reflectance of the 94/304 {angstrom} primary and secondary flight mirrors was measured at beamlinemore » X24C of the National Synchrotron Light Source (NSLS) at Brookhaven National Lab. Preliminary EUV reflectance measurements of the 94, 304 and 335 {angstrom} coatings were performed with a laser plasma source reflectometer located at Columbia University. Prior to multilayer coating, Atomic Force Microscopy (AFM) characterization and cleaning of all flight substrates was performed at LLNL.« less

Overview of Key Results from SDO Extreme ultraviolet Variability Experiment (EVE)

NASA Astrophysics Data System (ADS)

Woods, Tom; Eparvier, Frank; Jones, Andrew; Mason, James; Didkovsky, Leonid; Chamberlin, Phil

2016-10-01

The SDO Extreme ultraviolet Variability Experiment (EVE) includes several channels to observe the solar extreme ultraviolet (EUV) spectral irradiance from 1 to 106 nm. These channels include the Multiple EUV Grating Spectrograph (MEGS) A, B, and P channels from the University of Colorado (CU) and the EUV SpectroPhometer (ESP) channels from the University of Southern California (USC). The solar EUV spectrum is rich in many different emission lines from the corona, transition region, and chromosphere. The EVE full-disk irradiance spectra are important for studying the solar impacts in Earth's ionosphere and thermosphere and are useful for space weather operations. In addition, the EVE observations, with its high spectral resolution of 0.1 nm and in collaboration with AIA solar EUV images, have proven valuable for studying active region evolution and explosive energy release during flares and coronal eruptions. These SDO measurements have revealed interesting results such as understanding the flare variability over all wavelengths, discovering and classifying different flare phases, using coronal dimming measurements to predict CME properties of mass and velocity, and exploring the role of nano-flares in continual heating of active regions.

The Extreme Ultraviolet Explorer Mission

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) mission, currently scheduled from launch in September 1991, is described. The primary purpose of the mission is to survey the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation with the use of three EUV telescope, each sensitive to a different segment of the EUV band. A fourth telescope is planned to perform a high-sensitivity search of a limited sample of the sky in the shortest wavelength bands. The all-sky survey is planned to be carried out in the first six months of the mission in four bands, or colors, 70-180 A, 170-250 A, 400-600 A, and 500-700 A. The second phase of the mission is devoted to spectroscopic observations of EUV sources. A high-efficiency grazing-incidence spectrometer using variable line-space gratings is planned to provide spectral data with about 1-A resolution. An end-to-end model of the mission, from a stellar source to the resulting scientific data, is presented. Hypothetical data from astronomical sources were processed through this model and are shown.

H{α} Surges Aroused by Newly-emerging Satellite Bipolar Magnetic Field

NASA Astrophysics Data System (ADS)

Wang, J. F.; Zhou, T. H.; Ji, H. S.

2013-07-01

An Hα surge event occurred at AR NOAA 11259 on 2011 July 22. According to the BBSO (Big Bear Solar Observatory) Hα line-center observations, three surges continuously ejected from the same region to the north of the main-sunspot of AR 11259. All of surges ejected along a straight trajectory, and looked like the reversed Eiffel Tower. The first and second surges had the same process. Two bright points firstly appeared to the north of the main-sunspot. After several minutes, a surge appeared between the two bright points, and then rapidly ejected when the two points got most brightness.When the surge reached the maximum height, it disappeared quickly. However, the third surge appeared without bright points, and its height was only half of the others. Compared with SDO/HMI (Solar Dynamics Observatory/Helioseismic and Magnetic Imager) line-of-sight magnetogram, more than one hour before the first surge appeared, a satellite bipolar magnetic field emerged from the surge-ejection region. The newly-emerging positive magnetic flux showed a distinct decrease several minutes earlier than the ejection of the surges. We assumed that the surges was associated with the reconnection between the newly-emerging bipolar magnetic field and the existing (sunspot) magnetic field.

A stand-alone compact EUV microscope based on gas-puff target source.

PubMed

Torrisi, Alfio; Wachulak, Przemyslaw; Węgrzyński, Łukasz; Fok, Tomasz; Bartnik, Andrzej; Parkman, Tomáš; Vondrová, Šárka; Turňová, Jana; Jankiewicz, Bartłomiej J; Bartosewicz, Bartosz; Fiedorowicz, Henryk

2017-02-01

We report on a very compact desk-top transmission extreme ultraviolet (EUV) microscope based on a laser-plasma source with a double stream gas-puff target, capable of acquiring magnified images of objects with a spatial (half-pitch) resolution of sub-50 nm. A multilayer ellipsoidal condenser is used to focus and spectrally narrow the radiation from the plasma, producing a quasi-monochromatic EUV radiation (λ = 13.8 nm) illuminating the object, whereas a Fresnel zone plate objective forms the image. Design details, development, characterization and optimization of the EUV source and the microscope are described and discussed. Test object and other samples were imaged to demonstrate superior resolution compared to visible light microscopy. © 2016 The Authors Journal of Microscopy © 2016 Royal Microscopical Society.

Exploring EUV and SAQP pattering schemes at 5nm technology node

NASA Astrophysics Data System (ADS)

Hamed Fatehy, Ahmed; Kotb, Rehab; Lafferty, Neal; Jiang, Fan; Word, James

2018-03-01

For years, Moore's law keeps driving the semiconductors industry towards smaller dimensions and higher density chips with more devices. Earlier, the correlation between exposure source's wave length and the smallest resolvable dimension, mandated the usage of Deep Ultra-Violent (DUV) optical lithography system which has been used for decades to sustain Moore's law, especially when immersion lithography was introduced with 193nm ArF laser sources. As dimensions of devices get smaller beyond Deep Ultra-Violent (DUV) optical resolution limits, the need for Extremely Ultra-Violent (EUV) optical lithography systems was a must. However, EUV systems were still under development at that time for the mass-production in semiconductors industry. Theretofore, Multi-Patterning (MP) technologies was introduced to swirl about DUV optical lithography limitations in advanced nodes beyond minimum dimension (CD) of 20nm. MP can be classified into two main categories; the first one is to split the target itself across multiple masks that give the original target patterns when they are printed. This category includes Double, Triple and Quadruple patterning (DP, TP, and QP). The second category is the Self-Aligned Patterning (SAP) where the target is divided into Mandrel patterns and non-Mandrel patterns. The Mandrel patterns get printed first, then a self-aligned sidewalls are grown around these printed patterns drawing the other non-Mandrel targets, afterword, a cut mask(s) is used to define target's line-ends. This approach contains Self-Aligned-Double Pattering (SADP) and Self-Aligned- Quadruple-Pattering (SAQP). DUV and MP along together paved the way for the industry down to 7nm. However, with the start of development at the 5nm node and the readiness of EUV, the differentiation question is aroused again, which pattering approach should be selected, direct printing using EUV or DUV with MP, or a hybrid flow that contains both DUV-MP and EUV. In this work we are comparing two potential pattering techniques for Back End Of Line (BEOL) metal layers in the 5nm technology node, the first technique is Single Exposure EUV (SE-EUV) with a Direct Patterning EUV lithography process, and the second one is Self-Aligned Quadruple Patterning (SAQP) with a hybrid lithography processes, where the drawn metal target layer is decomposed into a Mandrel mask and Blocks/Cut mask, Mandrel mask is printed using DUV 193i lithography process, while Block/Cut Mask is printed using SE-EUV lithography process. The pros and cons of each technique are quantified based on Edge-Placement-Error (EPE) and Process Variation Band (PVBand) measured at 1D and 2D edges. The layout used in this comparison is a candidate layout for Foundries 5nm process node.

Efficient place and route enablement of 5-tracks standard-cells through EUV compatible N5 ruleset

NASA Astrophysics Data System (ADS)

Matti, L.; Gerousis, V.; Berekovic, M.; Debacker, P.; Sherazi, S. M. Y.; Milojevic, D.; Baert, R.; Ryckaert, J.; Kim, Ryoung-han; Verkest, Diederik; Raghavan, P.

2018-03-01

In imec predictive N5 technology platform (poly pitch 42nm, metal pitch 32nm), enabling cell height reduction from 6 to 5 tracks constitutes an interesting opportunity to reduce area of digital IP-blocks without increasing wafer cost. From a physical point of view, the two main challenges of reducing the number of tracks are posed by the increased difficulty of completing inter-cell connections in standard cell design, and by increased pin density that makes more challenging for the router to maintain high placement densities. Both these issues can potentially result into cell and chip area enlargement, thus mitigating or canceling the benefits of moving to 5-Tracks. In this study this side effect was avoided through a careful Design-Technology Co-Optimization approach (DTCO) [1], where a set of design arcs was used in conjunction with an EUV compatible ruleset that allowed efficient 5-Tracks standard cell design, resulting in final area gains up to 17% that were validated through a commercial state-of-the-art Place and Route (P&R) flow.

Cleaning process for EUV optical substrates

DOEpatents

Weber, Frank J.; Spiller, Eberhard A.

1999-01-01

A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.

Slowly varying component of extreme ultraviolet solar radiation and its relation to solar radio radiation

NASA Technical Reports Server (NTRS)

Chapman, R. D.; Neupert, W. M.

1974-01-01

A study of the correlations between solar EUV line fluxes and solar radio fluxes has been carried out. A calibration for the Goddard Space Flight Center EUV spectrum is suggested. The results are used to obtain an equation for the absolute EUV flux for several lines in the 150- to 400-A region and the total flux of 81 intense lines in the region, the 2800-MHz radio flux being used as independent variable.

Monitoring of solar far ultraviolet radiation from the OSO-5 satellite

NASA Technical Reports Server (NTRS)

Rense, W. A.; Parker, R.

1972-01-01

A spectrophotometer for monitoring the solar EUV in three broad wavelength bands is described. The kind of data obtained, along with sources of error, are presented. The content of the tape library which contains the data is outlined. The scientific results are discussed. These include the following: solar flares in the EUV, solar eclipse observations in the EUV, SFD's and relationship to solar flares, and the application of satellite sunrise and sunset data for the study of model upper atmospheres for the earth.

The creation of radiation dominated plasmas using laboratory extreme ultra-violet lasers

NASA Astrophysics Data System (ADS)

Tallents, G. J.; Wilson, S.; West, A.; Aslanyan, V.; Lolley, J.; Rossall, A. K.

2017-06-01

Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet (EUV) lasers is examined. Free electron degeneracy effects on ionization in the presence of a high EUV flux of radiation is shown to be important. Overlap of the physics of such plasmas with plasma material under compression in indirect inertial fusion is explored. The design of the focusing optics needed to achieve high irradiance (up to 1014 Wcm-2) using an EUV capillary laser is presented.

Ion Temperature Control of the Io Plasma Torus

NASA Technical Reports Server (NTRS)

Delamere, P. A.; Schneider, N. M.; Steffl, A. J.; Robbins, S. J.

2005-01-01

We report on observational and theoretical studies of ion temperature in the Io plasma torus. Ion temperature is a critical factor for two reasons. First, ions are a major supplier of energy to the torus electrons which power the intense EUV emissions. Second, ion temperature determines the vertical extent of plasma along field lines. Higher temperatures spread plasma out, lowers the density and slows reaction rates. The combined effects can play a controlling role in torus energetics and chemistry. An unexpected tool for the study of ion temperature is the longitudinal structure in the plasma torus which often manifests itself as periodic brightness variations. Opposite sides of the torus (especially magnetic longitudes 20 and 200 degrees) have been observed on numerous occasions to have dramatically different brightness, density, composition, ionization state, electron temperature and ion temperature. These asymmetries must ultimately be driven by different energy flows on the opposite sides, presenting an opportunity to observe key torus processes operating under different conditions. The most comprehensive dataset for the study of longitudinal variations was obtained by the Cassini UVIS instrument during its Jupiter flyby. Steffl (Ph.D. thesis, 2005) identified longitudinal variations in all the quantities listed above wit the exception of ion temperature. We extend his work by undertaking the first search for such variation in the UVIS dataset. We also report on a 'square centimeter' model of the torus which extend the traditional 'cubic centimeter' models by including the controlling effects of ion temperature more completely.

Multi-Wavelength Spectroscopic Observations of a White Light Flare Produced Directly by Non-thermal Electrons

NASA Astrophysics Data System (ADS)

Lee, Kyoung-Sun; Imada, Shinsuke; Watanabe, Kyoko; Bamba, Yumi; Brooks, David

2017-08-01

An X1.6 flare on 2014 October 22 was observed by multiple spectrometers in UV, EUV and X-ray (Hinode/EIS, IRIS, and RHESSI), and multi-wavelength imaging observations (SDO/AIA and HMI). We analyze a bright kernel that produces a white light (WL) flare with continuum enhancement and a hard X-ray (HXR) peak. Taking advantage of the spectroscopic observations of IRIS and Hinode/EIS, we measure the temporal variation of the plasma properties in the bright kernel in the chromosphere and corona. We find that explosive evaporation was observed when the WL emission occurred. The temporal correlation of the WL emission, HXR peak, and evaporation flows indicates that the WL emission was produced by accelerated electrons. We calculated the energy flux deposited by non-thermal electrons (observed by RHESSI) and compared it to the dissipated energy estimated from a chromospheric line (Mg II triplet) observed by IRIS. The deposited energy flux from the non-thermal electrons is about (3-7.7)x1010 erg cm-2 s-1 for a given low-energy cutoff of 30-40 keV, assuming the thick-target model. The energy flux estimated from the changes in temperature in the chromosphere measured using the Mg II subordinate line is about (4.6-6.7)×109 erg cm-2 s-1: ˜6%-22% of the deposited energy. This comparison of estimated energy fluxes implies that the continuum enhancement was directly produced by the non-thermal electrons.

Synchronized observations of bright points from the solar photosphere to the corona

NASA Astrophysics Data System (ADS)

Tavabi, Ehsan

2018-05-01

One of the most important features in the solar atmosphere is the magnetic network and its relationship to the transition region (TR) and coronal brightness. It is important to understand how energy is transported into the corona and how it travels along the magnetic field lines between the deep photosphere and chromosphere through the TR and corona. An excellent proxy for transportation is the Interface Region Imaging Spectrograph (IRIS) raster scans and imaging observations in near-ultraviolet (NUV) and far-ultraviolet (FUV) emission channels, which have high time, spectral and spatial resolutions. In this study, we focus on the quiet Sun as observed with IRIS. The data with a high signal-to-noise ratio in the Si IV, C II and Mg II k lines and with strong emission intensities show a high correlation with TR bright network points. The results of the IRIS intensity maps and dopplergrams are compared with those of the Atmospheric Imaging Assembly (AIA) and Helioseismic and Magnetic Imager (HMI) instruments onboard the Solar Dynamical Observatory (SDO). The average network intensity profiles show a strong correlation with AIA coronal channels. Furthermore, we applied simultaneous observations of the magnetic network from HMI and found a strong relationship between the network bright points in all levels of the solar atmosphere. These features in the network elements exhibited regions of high Doppler velocity and strong magnetic signatures. Plenty of corona bright points emission, accompanied by the magnetic origins in the photosphere, suggest that magnetic field concentrations in the network rosettes could help to couple the inner and outer solar atmosphere.

Well-defined EUV wave associated with a CME-driven shock

NASA Astrophysics Data System (ADS)

Cunha-Silva, R. D.; Selhorst, C. L.; Fernandes, F. C. R.; Oliveira e Silva, A. J.

2018-05-01

Aims: We report on a well-defined EUV wave observed by the Extreme Ultraviolet Imager (EUVI) on board the Solar Terrestrial Relations Observatory (STEREO) and the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The event was accompanied by a shock wave driven by a halo CME observed by the Large Angle and Spectrometric Coronagraph (LASCO-C2/C3) on board the Solar and Heliospheric Observatory (SOHO), as evidenced by the occurrence of type II bursts in the metric and dekameter-hectometric wavelength ranges. We investigated the kinematics of the EUV wave front and the radio source with the purpose of verifying the association between the EUV wave and the shock wave. Methods: The EUV wave fronts were determined from the SDO/AIA images by means of two appropriate directions (slices). The heights (radial propagation) of the EUV wave observed by STEREO/EUVI and of the radio source associated with the shock wave were compared considering the whole bandwidth of the harmonic lane of the radio emission, whereas the speed of the shock was estimated using the lowest frequencies of the harmonic lane associated with the undisturbed corona, using an appropriate multiple of the Newkirk (1961, ApJ, 133, 983) density model and taking into account the H/F frequency ratio fH/fF = 2. The speed of the radio source associated with the interplanetary shock was determined using the Mann et al. (1999, A&A, 348, 614) density model. Results: The EUV wave fronts determined from the SDO/AIA images revealed the coexistence of two types of EUV waves, a fast one with a speed of 560 km s-1, and a slower one with a speed of 250 km s-1, which corresponds approximately to one-third of the average speed of the radio source ( 680 km s-1). The radio signature of the interplanetary shock revealed an almost constant speed of 930 km s-1, consistent with the linear speed of the halo CME (950 km s-1) and with the values found for the accelerating coronal shock ( 535-823 km s-1), taking into account the gap between the radio emissions.

Stability and imaging of the ASML EUV alpha demo tool

NASA Astrophysics Data System (ADS)

Hermans, Jan V.; Baudemprez, Bart; Lorusso, Gian; Hendrickx, Eric; van Dijk, Andre; Jonckheere, Rik; Goethals, Anne-Marie

2009-03-01

Extreme Ultra-Violet (EUV) lithography is the leading candidate for semiconductor manufacturing of the 22nm technology node and beyond, due to the very short wavelength of 13.5nm. However, reducing the wavelength adds complexity to the lithographic process. The impact of the EUV specific conditions on lithographic performance needs to be understood, before bringing EUV lithography into pre-production. To provide early learning on EUV, an EUV fullfield scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC, using a Numerical Aperture (NA) of 0.25. In this paper we report on different aspects of the ADT: the imaging and overlay performance and both short and long-term stability. For 40nm dense Lines-Spaces (LS), the ADT shows an across field overlapping process window of 270nm Depth Of Focus (DOF) at 10% Exposure Latitude (EL) and a wafer CD Uniformity (CDU) of 3nm 3σ, without any corrections for process or reticle. The wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: slit intensity uniformity, focus plane deviation and reticle CD error. Taking these contributions into account, the CD through slit fingerprint for 40nm LS is simulated with excellent agreement to experimental data. The ADT shows good CD stability over 9 months of operation, both intrafield and across wafer. The projection optics reflectivity has not degraded over 9 months. Measured overlay performance with respect to a dry tool shows |Mean|+3σ below 20nm with more correction potential by applying field-by-field corrections (|Mean|+3σ <=10nm). For 22nm SRAM application, both contact hole and metal layer were printed in EUV with 10% CD and 15nm overlay control. Below 40nm, the ADT shows good wafer CDU for 30nm dense and isolated lines (on the same wafer) and 38nm dense Contact Holes (CH). First 28nm dense line CDU data are achieved. The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE Gen. 1 at IMEC.

Earth observation photo taken by JPL with the Shuttle Imaging Radar-A

NASA Technical Reports Server (NTRS)

1981-01-01

Earth observation photo taken by the Jet Propulsion Laboratory (JPL) with the Shuttle Imaging Radar-A (SIR-A). Image of California's coast from Point Concepcion (far left) to Ventura (right). The city of Santa Barbara is visible as a bright region (center). The row of bright spots in the ocean are oil drilling platforms in the Santa Barbara Channel, while the random points of brightness in the channel are vessels. Lakes Cachuma (left) and Casitas (right) are seen as large dark areas. Folded sedimentary rock layers are visible in the Santa Ynez Mountain Range which stretches down the coastline; the stratification terminates at the Santa Ynez fault on the island side of the mountains.

Digging for Fossils in the Hertzsprung Gap

NASA Technical Reports Server (NTRS)

Ayres, Thomas R.

1999-01-01

Objective was to conduct deep (approx. 250 ks) pointings on two EUV sources, the early-F giant beta Cas and the mid-G giant mu Velorum; to obtain spectra in the range 70-300 A and to record Deep Survey light curves over the extensive duration of each observation. We have analyzed the DS lightcurve and the SW spectrum, breaking the latter lip into time slices corresponding to key phases of the observation: pre-flare, flare rise, and two segments of the flare decay.

Double Bright Band Observations with High-Resolution Vertically Pointing Radar, Lidar, and Profiles

NASA Technical Reports Server (NTRS)

Emory, Amber E.; Demoz, Belay; Vermeesch, Kevin; Hicks, Michael

2014-01-01

On 11 May 2010, an elevated temperature inversion associated with an approaching warm front produced two melting layers simultaneously, which resulted in two distinct bright bands as viewed from the ER-2 Doppler radar system, a vertically pointing, coherent X band radar located in Greenbelt, MD. Due to the high temporal resolution of this radar system, an increase in altitude of the melting layer of approximately 1.2 km in the time span of 4 min was captured. The double bright band feature remained evident for approximately 17 min, until the lower atmosphere warmed enough to dissipate the lower melting layer. This case shows the relatively rapid evolution of freezing levels in response to an advancing warm front over a 2 h time period and the descent of an elevated warm air mass with time. Although observations of double bright bands are somewhat rare, the ability to identify this phenomenon is important for rainfall estimation from spaceborne sensors because algorithms employing the restriction of a radar bright band to a constant height, especially when sampling across frontal systems, will limit the ability to accurately estimate rainfall.

Double bright band observations with high-resolution vertically pointing radar, lidar, and profilers

NASA Astrophysics Data System (ADS)

Emory, Amber E.; Demoz, Belay; Vermeesch, Kevin; Hicks, Micheal

2014-07-01

On 11 May 2010, an elevated temperature inversion associated with an approaching warm front produced two melting layers simultaneously, which resulted in two distinct bright bands as viewed from the ER-2 Doppler radar system, a vertically pointing, coherent X band radar located in Greenbelt, MD. Due to the high temporal resolution of this radar system, an increase in altitude of the melting layer of approximately 1.2 km in the time span of 4 min was captured. The double bright band feature remained evident for approximately 17 min, until the lower atmosphere warmed enough to dissipate the lower melting layer. This case shows the relatively rapid evolution of freezing levels in response to an advancing warm front over a 2 h time period and the descent of an elevated warm air mass with time. Although observations of double bright bands are somewhat rare, the ability to identify this phenomenon is important for rainfall estimation from spaceborne sensors because algorithms employing the restriction of a radar bright band to a constant height, especially when sampling across frontal systems, will limit the ability to accurately estimate rainfall.

Simultaneous observations of changes in coronal bright point emission at the 20 cm radio and He Lambda 10830 wavelengths

NASA Technical Reports Server (NTRS)

Habbal, Shadia R.; Harvey, Karen L.

1986-01-01

Preliminary results of observations of solar coronal bright points acquired simultaneously from ground based observatories at the radio wavelength of 20 cm and in the He I wavelength 10830 line on September 8, 1985, are reported. The impetus for obtaining simultaneous radio and optical data is to identify correlations, if any, in changes of the low transition-coronal signatures of bright points with the evolution of the magnetic field, and to distinguish between intermittent heating and changes in the magnetic field topology. Although simultaneous observations of H alpha emission and the photospheric magnetic field at Big Bear were also made, as well as radio observations from Owen Valley Radio Interferometer and Solar Maximum Mission (SSM) (O VIII line), only the comparison between He 10830 and the Very Large Array (VLA) radio data are presented.

The novel top-coat material for RLS trade-off reduction in EUVL

NASA Astrophysics Data System (ADS)

Onishi, Ryuji; Sakamoto, Rikimaru; Fujitani, Noriaki; Endo, Takafumi; Ho, Bang-ching

2012-03-01

For the next generation lithography (NGL), several technologies have been proposed to achieve the 22nm-node devices and beyond. Extreme ultraviolet (EUV) lithography is one of the candidates for the next generation lithography. In EUV light source development, low power is one of the critical issue because of the low throughput, and another issue is Out of Band (OoB) light existing in EUV light. OoB is concerned to be the cause of deterioration for the lithography performance. In order to avoid this critical issue, we focused on development of the resist top coat material with OoB absorption property as Out of Band Protection Layer (OBPL). We designed this material having high absorbance around 240nm wavelength and high transmittance for EUV light. And this material aimed to improve sensitivity, resolution and LWR performance.

Inter-Comparison between July 24, 2014 EUV Data from NASA Sounding Rocket 36.289 and Concurrent Measurements from Orbital Solar Observatories

NASA Astrophysics Data System (ADS)

Didkovsky, L. V.; Wieman, S. R.; Judge, D. L.

2014-12-01

Sounding rocket mission NASA 36.289 Didkovsky provided solar EUV irradiance measurements from four instruments built at the USC Space Sciences Center: the Rare Gas Ionization Cell (RGIC), the Solar Extreme ultraviolet Monitor (SEM), the Dual Grating Spectrometer (DGS), and the Optics-Free Spectrometer (OFS), thus meeting the mission comprehensive success criteria. These sounding rocket data allow us to inter-compare the observed absolute EUV irradiance with the data taken at the same time from the SOHO and SDO solar observatories. The sounding rocket data from the two degradation-free instruments (DGS and OFS) can be used to verify the degradation rates of SOHO and SDO EUV channels and serve as a flight-proven prototypes for future improvements of degradation-free instrumentation for solar physics.

Design of the Extreme Ultraviolet Explorer long-wavelength grazing incidence telescope optics

NASA Technical Reports Server (NTRS)

Finley, David S.; Jelinsky, Patrick; Bowyer, Stuart; Malina, Roger F.

1988-01-01

Designing optics for photometry in the long-wavelength portion of the EUV spectrum (400-900) A) poses different problems from those arising for optics, operating shortward of 400 A. The available filter materials which transmit radiation longward of 400 A are also highly transparent at wavelengths shortward of 100 A. Conventional EUV optics, with grazing engles of less than about 10 deg, have very high throughput in the EUV, which persists to wavelengths shortward of 100 A. Use of such optics with the longer-wavelength EUV filters thus results in an unacceptably large soft X-ray leak. This problem is overcome by developing a mirror design with larger graze angles of not less than 20 deg, which has high throughput at wavelengths longer than 400 A but at the same time very little throughput shortward of 100 A.

A New Relationship Between Soft X-Rays and EUV Flare Light Curves

NASA Astrophysics Data System (ADS)

Thiemann, Edward

2016-05-01

Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, it emits radiation at different EUV wavelengths when the dropping temperature passes a line’s temperature of formation. This results in a delay in the emissions from cooler EUV lines relative to hotter EUV lines. Therefore, characterizing how this hot plasma cools is important for understanding how the corresponding geo-effective extreme ultraviolet (EUV) irradiance evolves in time. I present a simple new framework in which to study flare cooling by using a Lumped Element Thermal Model (LETM). LETM is frequently used in science and engineering to simplify a complex multi-dimensional thermal system by reducing it to a 0-D thermal circuit. For example, a structure that conducts heat out of a system is simplified with a resistive element and a structure that allows a system to store heat is simplified with a capacitive element. A major advantage of LETM is that the specific geometry of a system can be ignored, allowing for an intuitive analysis of the major thermal processes. I show that LETM is able to accurately reproduce the temporal evolution of cooler flare emission lines based on hotter emission line evolution. In particular, it can be used to predict the evolution of EUV flare light curves using the NOAA X-Ray Sensor (XRS).

Active galaxies observed during the Extreme Ultraviolet Explorer all-sky survey

NASA Technical Reports Server (NTRS)

Marshall, H. L.; Fruscione, A.; Carone, T. E.

1995-01-01

We present observations of active galactic nuclei (AGNs) obtained with the Extreme Ultraviolet Explorer (EUVE) during the all-sky survey. A total of 13 sources were detected at a significance of 2.5 sigma or better: seven Seyfert galaxies, five BL Lac objects, and one quasar. The fraction of BL Lac objects is higher in our sample than in hard X-ray surveys but is consistent with the soft X-ray Einstein Slew Survey, indicating that the main reason for the large number of BL Lac objects in the extreme ulktraviolet (EUV) and soft X-ray bands is their steeper X-ray spectra. We show that the number of AGNs observed in both the EUVE and ROSAT Wide Field Camera surveys can readily be explained by modelling the EUV spectra with a simple power law in the case of BL Lac objects and with an additional EUV excess in the case of Seyferts and quasars. Allowing for cold matter absorption in Seyfert galaxy hosts drive up the inferred average continuum slope to 2.0 +/- 0.5 (at 90% confidence), compared to a slope of 1.0 usually found from soft X-ray data. If Seyfert galaxies without EUV excesses form a significant fraction of the population, then the average spectrum of those with bumps should be even steeper. We place a conservative limit on neutral gas in BL Lac objects: N(sub H) less than 10(exp 20)/sq cm.

Absorption and emission of single attosecond light pulses in an autoionizing gaseous medium dressed by a time-delayed control field

NASA Astrophysics Data System (ADS)

Chu, Wei-Chun; Lin, C. D.

2013-01-01

An extreme ultraviolet (EUV) single attosecond pulse passing through a laser-dressed dense gas is studied theoretically. The weak EUV pulse pumps the helium gas from the ground state to the 2s2p(1P) autoionizing state, which is coupled to the 2s2(1S) autoionizing state by a femtosecond infrared laser with the intensity in the order of 1012 W/cm2. The simulation shows how the transient absorption and emission of the EUV are modified by the coupling laser. A simple analytical expression for the atomic response derived for δ-function pulses reveals the strong modification of the Fano lineshape in the spectra, where these features are quite universal and remain valid for realistic pulse conditions. We further account for the propagation of pulses in the medium and show that the EUV signal at the atomic resonance can be enhanced in the gaseous medium by more than 50% for specifically adjusted laser parameters, and that this enhancement persists as the EUV propagates in the gaseous medium. Our result demonstrates the high-level control of nonlinear optical effects that are achievable with attosecond pulses.

Design decisions from the history of the EUVE science payload

NASA Technical Reports Server (NTRS)

Marchant, W.

1993-01-01

Some of the design issues that arose during the development of the EUVE science payload and solutions to the problems involved are examined. In particular, attention is given to the use of parallel and serial busses, the selection of the the ROM approach for software storage and execution, implementation of memory error detection and correction, and the selection of command structures. The early design decisions paid off in the timely delivery of the scientific payload and in the successful completion of the survey phase of the EUVE science mission.

Design decisions from the history of the EUVE science payload

NASA Astrophysics Data System (ADS)

Marchant, W.

1993-09-01

Some of the design issues that arose during the development of the EUVE science payload and solutions to the problems involved are examined. In particular, attention is given to the use of parallel and serial busses, the selection of the the ROM approach for software storage and execution, implementation of memory error detection and correction, and the selection of command structures. The early design decisions paid off in the timely delivery of the scientific payload and in the successful completion of the survey phase of the EUVE science mission.

Debris- and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

NASA Astrophysics Data System (ADS)

Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.

2007-05-01

Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

State-of-the-art EUV materials and processes for the 7nm node and beyond

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

2017-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the most promising materials tested.

Solar EUV Irradiance Measurements by the Auto-Calibrating EUV Spectrometers (SolACES) Aboard the International Space Station (ISS)

NASA Astrophysics Data System (ADS)

Schmidtke, G.; Nikutowski, B.; Jacobi, C.; Brunner, R.; Erhardt, C.; Knecht, S.; Scherle, J.; Schlagenhauf, J.

2014-05-01

SolACES is part of the ESA SOLAR ISS mission that started aboard the shuttle mission STS-122 on 7 February 2008. The instrument has recorded solar extreme ultraviolet (EUV) irradiance from 16 to 150 nm during the extended solar activity minimum and the beginning solar cycle 24 with rising solar activity and increasingly changing spectral composition. The SOLAR mission has been extended from a period of 18 months to > 8 years until the end of 2016. SolACES is operating three grazing incidence planar grating spectrometers and two three-current ionization chambers. The latter ones are considered as primary radiometric detector standards. Re-filling the ionization chambers with three different gases repeatedly and using overlapping band-pass filters, the absolute EUV fluxes are derived in these spectral intervals. This way the serious problem of continuing efficiency changes in space-borne instrumentation is overcome during the mission. Evaluating the three currents of the ionization chambers, the overlapping spectral ranges of the spectrometers and of the filters plus inter-comparing the results from the EUV photon absorption in the gases with different absorption cross sections, there are manifold instrumental possibilities to cross-check the results providing a high degree of reliability to the spectral irradiance derived. During the mission a very strong up-and-down variability of the spectrometric efficiency by orders of magnitude is observed. One of the effects involved is channeltron degradation. However, there are still open questions on other effects contributing to these changes. A survey of the measurements carried out and first results of the solar spectral irradiance (SSI) data are presented. Inter-comparison with EUV data from other space missions shows good agreement such that the international effort has started to elaborate a complete set of EUV-SSI data taking into account all data available from 2008 to 2013.

Recent status of resist outgas testing for metal containing resists at EIDEC

NASA Astrophysics Data System (ADS)

Shiobara, Eishi; Mikami, Shinji; Yamada, Kenji

2018-03-01

The metal containing resist is one of the strong candidates for high lithographic performance Extreme Ultraviolet (EUV) resists. EIDEC has prepared the infrastructure for outgas testing in hydrogen environment for metal containing resists at High Power EUV irradiation tool (HPEUV). We have experimentally obtained the preliminary results of the non-cleanable metal contamination on witness sample using model material by HPEUV [1]. The metal contamination was observed at only the condition of hydrogen environment. It suggested the generation of volatile metal hydrides by hydrogen radicals. Additionally, the metal contamination on a witness sample covered with Ru was not removed by hydrogen radical cleaning. The strong interaction between the metal hydride and Ru was confirmed by the absorption simulation [2]. Recently, ASML announced a resist outgassing barrier technology using Dynamic Gas Lock (DGL) membrane located between projection optics and wafer stage [3, 4]. DGL membrane blocks the diffusion of all kinds of resist outgassing to the projection optics and prevents the reflectivity loss of EUV mirrors. The investigation of DGL membrane for high volume manufacturing is just going on. It extends the limitation of material design for EUV resists. However, the DGL membrane has an impact for the productivity of EUV scanners due to the transmission loss of EUV light and the necessity of periodic maintenance. The well understanding and control of the outgassing characteristics of metal containing resists may help to improve the productivity of EUV scanner. We consider the outgas evaluation for the resists still useful. For the improvement of resist outgas testing in hydrogen, there are some issues such as the contamination limited regime, the optimization of exposure dose to obtain the measurable contamination film thickness and the detection of minimum amount of metal related outgas species generated. We are considering a new platform of outgas testing for metal containing resists based on the electron-beam irradiation system as one of the solutions for these issues. The concept is presented in this paper.

Designing a Small-Sized Engineering Model of Solar EUV Telescopr for a Korean Satellite

NASA Astrophysics Data System (ADS)

Han, Jung-Hoon; Jang, Min-Hwan; Kim, Sang-Joon

2001-11-01

For the research of solar EUV (extreme ultraviolet) radiation, we have designed a small-sized engineering model of solar EUV telescope, which is suitable for a Korean satellite. The EUV solar telescope was designed to observe the sun at 584.3Å (He¥°) and 629.7Å (O¥´). The optical system is an f/8 Ritchey-Chrètien, and the effective diameter and focal length are 80§® and 640§®, respectively. The He¥°and O¥´ filters are loaded in a filter wheel. In the detection part, the MCP (MicroChannel Plate) type is Z-stack, and the channel-to-diameter ratio is 40:1. MCP and CCD are connected by fiber optic taper. A commercial optical design software is used for the analysis of the optical system design.

LASER APPLICATIONS AND OTHER TOPICS IN QUANTUM ELECTRONICS: Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits

NASA Astrophysics Data System (ADS)

Borisov, V. M.; Vinokhodov, A. Yu; Ivanov, A. S.; Kiryukhin, Yu B.; Mishchenko, V. A.; Prokof'ev, A. V.; Khristoforov, O. B.

2009-10-01

The development of high-power discharge sources emitting in the 13.5±0.135-nm spectral band is of current interest because they are promising for applications in industrial EUV (extreme ultraviolet) lithography for manufacturing integrated circuits according to technological precision standards of 22 nm and smaller. The parameters of EUV sources based on a laser-induced discharge in tin vapours between rotating disc electrodes are investigated. The properties of the discharge initiation by laser radiation at different wavelengths are established and the laser pulse parameters providing the maximum energy characteristics of the EUV source are determined. The EUV source developed in the study emits an average power of 276 W in the 13.5±0.135-nm spectral band on conversion to the solid angle 2π sr in the stationary regime at a pulse repetition rate of 3000 Hz.

Large-Scale Coronal Heating, Clustering of Coronal Bright Points, and Concentration of Magnetic Flux

NASA Technical Reports Server (NTRS)

Falconer, D. A.; Moore, R. L.; Porter, J. G.; Hathaway, D. H.

1998-01-01

By combining quiet-region Fe XII coronal images from SOHO/EIT with magnetograms from NSO/Kitt Peak and from SOHO/MDI, we show that on scales larger than a supergranule the population of network coronal bright points and the magnetic flux content of the network are both markedly greater under the bright half of the quiet corona than under the dim half. These results (1) support the view that the heating of the entire corona in quiet regions and coronal holes is driven by fine-scale magnetic activity (microflares, explosive events, spicules) seated low in the magnetic network, and (2) suggest that this large-scale modulation of the magnetic flux and coronal heating is a signature of giant convection cells.

Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

NASA Astrophysics Data System (ADS)

Svalgaard, Leif

2016-11-01

Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

Overlying extreme-ultraviolet arcades preventing eruption of a filament observed by AIA/SDO

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Huadong; Ma, Suli; Zhang, Jun, E-mail: hdchen@upc.edu.cn

2013-11-20

Using the multi-wavelength data from the Atmospheric Imaging Assembly/Solar Dynamic Observatory (AIA/SDO) and the Sun Earth Connection Coronal and Heliospheric Investigation/Solar Terrestrial Relations Observatory (SECCHI/STEREO), we report a failed filament eruption in NOAA AR 11339 on 2011 November 3. The eruption was associated with an X1.9 flare, but without any coronal mass ejection (CME), coronal dimming, or extreme ultraviolet (EUV) waves. Some magnetic arcades above the filament were observed distinctly in EUV channels, especially in the AIA 94 Å and 131 Å wavebands, before and during the filament eruption process. Our results show that the overlying arcades expanded along withmore » the ascent of the filament at first until they reached a projected height of about 49 Mm above the Sun's surface, where they stopped. The following filament material was observed to be confined by the stopped EUV arcades and not to escape from the Sun. After the flare, a new filament formed at the low corona where part of the former filament remained before its eruption. These results support that the overlying arcades play an important role in preventing the filament from successfully erupting outward. We also discuss in this paper the EUV emission of the overlying arcades during the flare. It is rare for a failed filament eruption to be associated with an X1.9 class flare, but not with a CME or EUV waves. Therefore, this study also provides valuable insight into the triggering mechanism of the initiation of CMEs and EUV waves.« less

Quasi-periodic Fast-mode Wave Trains Within a Global EUV Wave and Sequential Transverse Oscillations Detected by SDO-AIA

NASA Technical Reports Server (NTRS)

Liu, Wei; Ofman, Leon; Nitta, Nariaki; Aschwanden, Markus J.; Schrijver, Carolus J.; Title, Alan M.; Tarbell, Theodore D.

2012-01-01

We present the first unambiguous detection of quasi-periodic wave trains within the broad pulse of a global EUV wave (so-called EIT wave) occurring on the limb. These wave trains, running ahead of the lateral coronal mass ejection (CME) front of 2-4 times slower, coherently travel to distances greater than approximately solar radius/2 along the solar surface, with initial velocities up to 1400 kilometers per second decelerating to approximately 650 kilometers per second. The rapid expansion of the CME initiated at an elevated height of 110 Mm produces a strong downward and lateral compression, which may play an important role in driving the primary EUV wave and shaping its front forwardly inclined toward the solar surface. The wave trains have a dominant 2 minute periodicity that matches the X-ray flare pulsations, suggesting a causal connection. The arrival of the leading EUV wave front at increasing distances produces an uninterrupted chain sequence of deflections and/or transverse (likely fast kink mode) oscillations of local structures, including a flux-rope coronal cavity and its embedded filament with delayed onsets consistent with the wave travel time at an elevated (by approximately 50%) velocity within it. This suggests that the EUV wave penetrates through a topological separatrix surface into the cavity, unexpected from CME-caused magnetic reconfiguration. These observations, when taken together, provide compelling evidence of the fast-mode MHD wave nature of the primary (outer) fast component of a global EUV wave, running ahead of the secondary (inner) slow component of CME-caused restructuring.

Hot interstellar gas and ionization of embedded clouds

NASA Technical Reports Server (NTRS)

Cheng, K.-P.; Bruhweiler, F.

1990-01-01

Researchers present detailed photoionization calculations for the instellar cloud in which the Sun is embedded. They consider the EUV radiation field with contribution from discrete stellar sources and from a thermal bremsstrahlung-radiative recombination spectrum emitted from the surrounding 10 to the 6th power k coronal substrate. They establish lower limits to the fractional ionization of hydrogen and helium of 0.17 and 0.29 respectively. The high He ionization fraction results primarily from very strong line emission below 500 A originating in the surrounding coronal substrate while the H ionization is dominated by the EUV radiation from the discrete stellar sources. The dual effects of thermal conduction and the EUV spectrum of the 10 to the 6th k plasma on ionization in the cloud skin are explored. The EUV radiation field and Auger ionization have insignificant effects on the resulting ionic column densities of Si IV, C IV, N V and O VI through the cloud skin. Calculations show that the abundances of these species are dominated by collisional ionization in the thermal conduction front. Because of a low charge exchange rate with hydrogen, the ionic column density ratios of N (CIII)/N (CII) and N (NII)/N (NI) are dominated by the EUV radiation field in the local interstellar medium. These ratios should be important diagnostics for the EUV radiation field and serve as surrogate indicators of the interstellar He and H ionization fraction respectively. Spacecraft such as Lyman which is designed to obtain high resolution spectral data down to the Lyman limit at 912 A could sample interstellar lines of these ions.

Microfabrication of through holes in polydimethylsiloxane (PDMS) sheets using a laser plasma EUV source (Conference Presentation)

NASA Astrophysics Data System (ADS)

Makimura, Tetsuya; Urai, Hikari; Niino, Hiroyuki

2017-03-01

Polydimethylsiloxane (PDMS) is a material used for cell culture substrates / bio-chips and micro total analysis systems / lab-on-chips due to its flexibility, chemical / thermo-dynamic stability, bio-compatibility, transparency and moldability. For further development, it is inevitable to develop a technique to fabricate precise three dimensional structures on micrometer-scale at high aspect ratio. In the previous works, we reported a technique for high-quality micromachining of PDMS without chemical modification, by means of photo direct machining using laser plasma EUV sources. In the present work, we have investigated fabrication of through holes. The EUV radiations around 10 nm were generated by irradiation of Ta targets with Nd:YAG laser light (10 ns, 500 mJ/pulse). The generated EUV radiations were focused using an ellipsoidal mirror. It has a narrower incident angle than those in the previous works in order to form a EUV beam with higher directivity, so that higher aspect structures can be fabricated. The focused EUV beam was incident on PDMS sheets with a thickness of 15 micrometers, through holes in a contact mask placed on top of them. Using a contact mask with holes with a diameter of three micrometers, complete through holes with a diameter of two micrometers are fabricated in the PDMS sheet. Using a contact mask with two micrometer holes, however, ablation holes almost reaches to the back side of the PDMS sheet. The fabricated structures can be explained in terms of geometrical optics. Thus, we have developed a technique for micromachining of PDMS sheets at high aspect ratios.

Toward compact and ultra-intense laser driven soft x-ray lasers (Conference Presentation)

NASA Astrophysics Data System (ADS)

Sebban, Stéphane

2017-05-01

We report here recent work on an optical-field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by optical field ionization focusing a 1 J, 30 fs, circularly- polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d94p (J=0) --> 3d94p (J=1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The polarization of the HH-seeded EUV laser beam was studied using an analyzer composed of three grazing incidence EUV multilayer mirrors able to spin under vacuum. For linear polarization, the Malus law has been recovered while in the case of a circularly-polarized seed, the EUV signal is insensitive to the rotation of the analyzer, bearing testimony to circularly polarized. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs FWHM as the amplification peak rose from 150 to 1,200 with an increase of the plasma density from 3 × 1018 cm-3 up to 1.2 × 1020 cm-3. The integrated energy of the EUV laser pulse was also measured, and found to be around 2 μJ. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 3 cm), yielding EUV outputs up to 14 μJ.

Advanced EUV mask and imaging modeling

NASA Astrophysics Data System (ADS)

Evanschitzky, Peter; Erdmann, Andreas

2017-10-01

The exploration and optimization of image formation in partially coherent EUV projection systems with complex source shapes requires flexible, accurate, and efficient simulation models. This paper reviews advanced mask diffraction and imaging models for the highly accurate and fast simulation of EUV lithography systems, addressing important aspects of the current technical developments. The simulation of light diffraction from the mask employs an extended rigorous coupled wave analysis (RCWA) approach, which is optimized for EUV applications. In order to be able to deal with current EUV simulation requirements, several additional models are included in the extended RCWA approach: a field decomposition and a field stitching technique enable the simulation of larger complex structured mask areas. An EUV multilayer defect model including a database approach makes the fast and fully rigorous defect simulation and defect repair simulation possible. A hybrid mask simulation approach combining real and ideal mask parts allows the detailed investigation of the origin of different mask 3-D effects. The image computation is done with a fully vectorial Abbe-based approach. Arbitrary illumination and polarization schemes and adapted rigorous mask simulations guarantee a high accuracy. A fully vectorial sampling-free description of the pupil with Zernikes and Jones pupils and an optimized representation of the diffraction spectrum enable the computation of high-resolution images with high accuracy and short simulation times. A new pellicle model supports the simulation of arbitrary membrane stacks, pellicle distortions, and particles/defects on top of the pellicle. Finally, an extension for highly accurate anamorphic imaging simulations is included. The application of the models is demonstrated by typical use cases.

Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

NASA Astrophysics Data System (ADS)

Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

2011-03-01

Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

Eruptions that Drive Coronal Jets in a Solar Active Region

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.; Moore, Ronald L.; Falconer, David A.; Panesar, Navdeep K.; Akiyama, Sachiko; Yashiro, Seiji; Gopalswamy, Nat

2016-01-01

Solar coronal jets are common in both coronal holes and in active regions (e.g., Shibata et al. 1992, Shimojo et al. 1996, Cirtain et al. 2007. Savcheva et al. 2007). Recently, Sterling et al. (2015), using data from Hinode/XRT and SDO/AIA, found that coronal jets originating in polar coronal holes result from the eruption of small-scale filaments (minifilaments). The jet bright point (JBP) seen in X-rays and hotter EUV channels off to one side of the base of the jet's spire develops at the location where the minifilament erupts, consistent with the JBPs being miniature versions of typical solar flares that occur in the wake of large-scale filament eruptions. Here we consider whether active region coronal jets also result from the same minifilament-eruption mechanism, or whether they instead result from a different mechanism (e.g. Yokoyama & Shibata 1995). We present observations of an on-disk active region (NOAA AR 11513) that produced numerous jets on 2012 June 30, using data from SDO/AIA and HMI, and from GOES/SXI. We find that several of these active region jets also originate with eruptions of miniature filaments (size scale 20'') emanating from small-scale magnetic neutral lines of the region. This demonstrates that active region coronal jets are indeed frequently driven by minifilament eruptions. Other jets from the active region were also consistent with their drivers being minifilament eruptions, but we could not confirm this because the onsets of those jets were hidden from our view. This work was supported by funding from NASA/LWS, NASA/HGI, and Hinode. A full report of this study appears in Sterling et al. (2016).

Temporal and Latitudinal Variations of the Length-Scales and Relative Intensities of the Chromospheric Network

NASA Astrophysics Data System (ADS)

Raju, K. P.

2018-05-01

The Calcium K spectroheliograms of the Sun from Kodaikanal have a data span of about 100 years and covers over 9 solar cycles. The Ca line is a strong chromospheric line dominated by chromospheric network and plages which are good indicators of solar activity. Length-scales and relative intensities of the chromospheric network have been obtained in the solar latitudes from 50 degree N to 50 degree S from the spectroheliograms. The length-scale was obtained from the half-width of the two-dimensional autocorrelation of the latitude strip which gives a measure of the width of the network boundary. As reported earlier for the transition region extreme ultraviolet (EUV) network, relative intensity and width of the chromospheric network boundary are found to be dependent on the solar cycle. A varying phase difference has been noticed in the quantities in different solar latitudes. A cross-correlation analysis of the quantities from other latitudes with ±30 degree latitude revealed an interesting phase difference pattern indicating flux transfer. Evidence of equatorward flux transfer has been observed. The average equatorward flux transfer was estimated to be 5.8 ms-1. The possible reasons of the drift could be meridional circulation, torsional oscillations, or the bright point migration. Cross-correlation of intensity and length-scale from the same latitude showed increasing phase difference with increasing latitude. We have also obtained the cross correlation of the quantities across the equator to see the possible phase lags in the two hemispheres. Signatures of lags are seen in the length scales of southern hemisphere near the equatorial latitudes, but no such lags in the intensity are observed. The results have important implications on the flux transfer over the solar surface and hence on the solar activity and dynamo.

Lyman Alpha Camera for Io's SO2 atmosphere and Europa's water plumes

NASA Astrophysics Data System (ADS)

McEwen, Alfred S.; Sandel, Bill; Schneider, Nick

2014-05-01

The Student Lyman-Alpha Mapper (SLAM) was conceived for the Io Volcano Observer (IVO) mission proposal (McEwen et al., 2014) to determine the spatial and temporal variations in Io's SO2 atmosphere by recording the H Ly-α reflection over the disk (Feldman et al., 2000; Feaga et al., 2009). SO2 absorbs at H Ly-α, thereby modulating the brightness of sunlight reflected by the surface, and measures the density of the SO2 atmosphere and its variability with volcanic activity and time of day. Recently, enhancements at the Ly-α wavelength (121.57 nm) were seen near the limb of Europa and interpreted as active water plumes ~200 km high (Roth et al., 2014). We have a preliminary design for a very simple camera to image in a single bandpass at Ly-α, analogous to a simplified version of IMAGE EUV (Sandel et al. 2000). Our goal is at least 50 resolution elements across Io and/or Europa (~75 km/pixel), ~3x better than HST STIS, to be acquired at a range where the radiation noise is below 1E-4 hits/pixel/s. This goal is achieved with a Cassegrain-like telescope with a 10-cm aperture. The wavelength selection is achieved using a simple self-filtering mirror in combination with a solar-blind photocathode. A photon-counting detector based on a sealed image intensifier preserves the poisson statistics of the incoming photon flux. The intensifier window is coated with a solar-blind photocathode material (CsI). The location of each photon event is recorded by a position-sensitive anode based on crossed delay-line or wedge-and-strip technology. The sensitivity is 0.01 counts/pixel/sec/R, sufficient to estimate SO2 column abundances ranging from 1E15 to 1E17 per cm2 in a 5 min (300 sec) exposure. Sensitivity requirements to search for and image Europa plumes may be similar. Io's Ly-α brightness of ~3 kR exceeds the 0.8 kR brightness of Europa's plume reported by Roth et al. (2014), but the plume brightness is a direct measurement rather than inferring column abundance from absorption. Also, the radiation-induced noise is lower at Europa, permitting longer exposure times and imaging at closer range. This is a very simple instrument with no moving parts, a mass of 4 kg (plus 1.7 kg radiation shielding), and it needs 4 W power. It has no special accommodation requirements and would simply collect data in ride-along mode during point-and-stare sequences. Feaga, L.M., et al. (2009) Io's dayside SO2 atmosphere, Icarus 201, 570-584 (2009). Feldman, P.D., et al., (2000) Lyman-α imaging of the SO2 distribution on Io, Geophys. Res. Lett., 27, 1787-1790. McEwen, A.S. et al. (2014) Io Volcano Observer (IVO): Budget travel to the outer Solar System. Acta Astronautica 93, 539-544. Roth, L. et al. (2014) Transient water vapor at Europa's south pole. Science 343, 171. Sandel, B., et al. (2000) The Extreme Ultraviolet Imager investigation for the IMAGE mission. Space Sci. Rev. 91, 197-242.

EUV/soft x-ray spectra for low B neutron stars

NASA Technical Reports Server (NTRS)

Romani, Roger W.; Rajagopal, Mohan; Rogers, Forrest J.; Iglesias, Carlos A.

1995-01-01

Recent ROSAT and EUVE detections of spin-powered neutron stars suggest that many emit 'thermal' radiation, peaking in the EUV/soft X-ray band. These data constrain the neutron stars' thermal history, but interpretation requires comparison with model atmosphere computations, since emergent spectra depend strongly on the surface composition and magnetic field. As recent opacity computations show substantial change to absorption cross sections at neutron star photospheric conditions, we report here on new model atmosphere computations employing such data. The results are compared with magnetic atmosphere models and applied to PSR J0437-4715, a low field neutron star.

Method and apparatus for inspecting an EUV mask blank

DOEpatents

Goldberg, Kenneth A.

2005-11-08

An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 .mu.m and above.

Nanoparticle photoresist studies for EUV lithography

NASA Astrophysics Data System (ADS)

Kasahara, Kazuki; Xu, Hong; Kosma, Vasiliki; Odent, Jeremy; Giannelis, Emmanuel P.; Ober, Christopher K.

2017-03-01

EUV (extreme ultraviolet) lithography is one of the most promising candidates for next generation lithography. The main challenge for EUV resists is to simultaneously satisfy resolution, LWR (line-width roughness) and sensitivity requirements according to the ITRS roadmap. Though polymer type CAR (chemically amplified resist) is the currently standard photoresist, entirely new resist platforms are required due to the performance targets of smaller process nodes. In this paper, recent progress in nanoparticle photoresists which Cornell University has intensely studied is discussed. Lithography performance, especially scum elimination, improvement studies with the dissolution rate acceleration concept and new metal core applications are described.

Research on vacuum utraviolet calibration technology

NASA Astrophysics Data System (ADS)

Wang, Jiapeng; Gao, Shumin; Sun, Hongsheng; Chen, Yinghang; Wei, Jianqiang

2014-11-01

Importance of extreme ultraviolet (EUV) and far ultraviolet (FUV) calibration is growing fast as vacuum ultraviolet payloads are wildly used in national space plan. A calibration device is established especially for the requirement of EUV and FUV metrology and measurement. Spectral radiation and detector relative spectral response at EUV and FUV wavelengths can be calibrated with accuracy of 26% and 20%, respectively. The setup of the device, theoretical model and value retroactive method are introduced and measurement of detector relative spectral response from 30 nm to 200 nm is presented in this paper. The calibration device plays an important role in national space research.

SoFAST: Automated Flare Detection with the PROBA2/SWAP EUV Imager

NASA Astrophysics Data System (ADS)

Bonte, K.; Berghmans, D.; De Groof, A.; Steed, K.; Poedts, S.

2013-08-01

The Sun Watcher with Active Pixels and Image Processing (SWAP) EUV imager onboard PROBA2 provides a non-stop stream of coronal extreme-ultraviolet (EUV) images at a cadence of typically 130 seconds. These images show the solar drivers of space-weather, such as flares and erupting filaments. We have developed a software tool that automatically processes the images and localises and identifies flares. On one hand, the output of this software tool is intended as a service to the Space Weather Segment of ESA's Space Situational Awareness (SSA) program. On the other hand, we consider the PROBA2/SWAP images as a model for the data from the Extreme Ultraviolet Imager (EUI) instrument prepared for the future Solar Orbiter mission, where onboard intelligence is required for prioritising data within the challenging telemetry quota. In this article we present the concept of the software, the first statistics on its effectiveness and the online display in real time of its results. Our results indicate that it is not only possible to detect EUV flares automatically in an acquired dataset, but that quantifying a range of EUV dynamics is also possible. The method is based on thresholding of macropixelled image sequences. The robustness and simplicity of the algorithm is a clear advantage for future onboard use.

[Activities of Bay Area Research Corporation

NASA Technical Reports Server (NTRS)

2003-01-01

During the final year of this effort the HALFSHEL code was converted to work on a fast single processor workstation from it s parallel configuration. This was done because NASA Ames NAS facility stopped supporting space science and we no longer had access to parallel computer time. The single processor version of HALFSHEL was upgraded to address low density cells by using a a 3-D SOR solver to solve the equation Delta central dot E = 0. We then upgraded the ionospheric load packages to provide a multiple species load of the ionosphere out to 1.4 Rm. With these new tools we began to perform a series of simulations to address the major topic of this research effort; determining the loss rate of O(sup +) and O2(sup +) from Mars. The simulations used the nominal Parker spiral field and in one case used a field perpendicular to the solar wind flow. The simulations were performed for three different solar EUV fluxes consistent with the different solar evolutionary states believed to exist before today. The 1 EUV case is the nominal flux of today. The 3 EUV flux is called Epoch 2 and has three times the flux of todays. The 6 EUV case is Epoch 3 and has 6 times the EUV flux of today.

A 1kW EUV source for lithography based on FEL emission in a compact storage ring

NASA Astrophysics Data System (ADS)

Feser, Michael; Ruth, Ron; Loewen, Rod

2017-10-01

EUV has long been hailed as the next generation lithography technology. Its adoption into high volume manufacturing (HVM), however, has been delayed several technology nodes due to technical issues, many of which can be attributed to the EUV source performance. Today's EUV lithography scanners are powered by laser produce plasma (LPP) sources. They have issues with power scaling beyond 300 W, reliability and contamination. Free Electron Lasers (FELs) have been considered as an alternative EUV source. Advantages of accelerator based sources are the maturity of the accelerator technology, lack of debris/contamination, and ability to provide high power. Industry turned away from this technology because of the requirement to feed up to 10 scanners from one linear FEL to make it economically feasible, the large footprint, and generation of radioactive byproducts. All of these issues are overcome in the presented concept using a compact storage ring with steady-state FEL lasing action. At 1 kW output power, comparable cost and footprint to an LPP source, this source is ideally suited for use on a single scanner and promises reliable, contamination free operation. FEL action in the storage ring is sustained by operating the FEL well below the saturation regime and preserving the equilibrium low emittance and energy distribution of the ring.

Response of inorganic materials to laser - plasma EUV radiation focused with a lobster eye collector

NASA Astrophysics Data System (ADS)

Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Miroslaw; Havlikova, Radka; Pína, Ladislav; Švéda, Libor; Inneman, Adolf

2007-05-01

A single photon of EUV radiation carries enough energy to break any chemical bond or excite electrons from inner atomic shells. It means that the radiation regardless of its intensity can modify chemical structure of molecules. It is the reason that the radiation even with low intensity can cause fragmentation of long chains of organic materials and desorption of small parts from their surface. In this work interaction of EUV radiation with inorganic materials was investigated. Different inorganic samples were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The radiation was focused on a sample surface using a lobster eye collector. Radiation fluence at the surface reached 30 mJ/cm2 within a wavelength range 7 - 20 nm. In most cases there was no surface damage even after several minutes of irradiation. In some cases there could be noticed discolouration of an irradiated surface or evidences of thermal effects. In most cases however luminescent and scattered radiation was observed. The luminescent radiation was emitted in different wavelength ranges. It was recorded in a visible range of radiation and also in a wide wavelength range including UV, VUV and EUV. The radiation was especially intense in a case of non-metallic chemical compounds.

Magnetron sputtering for the production of EUV mask blanks

NASA Astrophysics Data System (ADS)

Kearney, Patrick; Ngai, Tat; Karumuri, Anil; Yum, Jung; Lee, Hojune; Gilmer, David; Vo, Tuan; Goodwin, Frank

2015-03-01

Ion Beam Deposition (IBD) has been the primary technique used to deposit EUV mask blanks since 1995 when it was discovered it could produce multilayers with few defects. Since that time the IBD technique has been extensively studied and improved and is finally approaching usable defectivities. But in the intervening years, the defectivity of magnetron sputtering has been greatly improved. This paper evaluates the suitability of a modern magnetron tool to produce EUV mask blanks and the ability to support HVM production. In particular we show that the reflectivity and uniformity of these tools are superior to current generation IBD tools, and that the magnetron tools can produce EUV films with defect densities comparable to recent best IBD tool performance. Magnetron tools also offer many advantages in manufacturability and tool throughput; however, challenges remain, including transitioning the magnetron tools from the wafer to mask formats. While work continues on quantifying the capability of magnetron sputtering to meet the mask blank demands of the industry, for the most part the remaining challenges do not require any fundamental improvements to existing technology. Based on the recent results and the data presented in this paper there is a clear indication that magnetron deposition should be considered for the future of EUV mask blank production.

Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shahzad, M.; Culfa, O.; Rossall, A. K.

2015-02-15

We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV).more » A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.« less

Study on the lifetime of Mo/Si multilayer optics with pulsed EUV-source at the ETS

NASA Astrophysics Data System (ADS)

Schürmann, Mark; Yulin, Sergiy; Nesterenko, Viatcheslav; Feigl, Torsten; Kaiser, Norbert; Tkachenko, Boris; Schürmann, Max C.

2011-06-01

As EUV lithography is on its way into production stage, studies of optics contamination and cleaning under realistic conditions become more and more important. Due to this fact an Exposure Test Stand (ETS) has been constructed at XTREME technologies GmbH in collaboration with Fraunhofer IOF and with financial support of Intel Corporation. This test stand is equipped with a pulsed DPP source and allows for the simultaneous exposure of several samples. In the standard set-up four samples with an exposed area larger than 35 mm2 per sample can be exposed at a homogeneous intensity of 0.25 mW/mm2. A recent update of the ETS allows for simultaneous exposures of two samples with intensities up to 1.0 mW/mm2. The first application of this alternative set-up was a comparative study of carbon contamination rates induced by EUV radiation from the pulsed source with contamination rates induced by quasicontinuous synchrotron radiation. A modified gas-inlet system allows for the introduction of a second gas to the exposure chamber. This possibility was applied to investigate the efficiency of EUV-induced cleaning with different gas mixtures. In particular the enhancement of EUV-induced cleaning by addition of a second gas to the cleaning gas was studied.

Study on dissolution behavior of polymer-bound and polymer-blended photo-acid generator (PAG) resists

NASA Astrophysics Data System (ADS)

Yamamoto, Hiroki; Kozawa, Takahiro; Tagawa, Seiichi

2013-03-01

The requirements for the next generation resist materials are so challenging that it is indispensable for feasibility of EUV lithography to grasp basic chemistry of resist matrices in all stage of resist processes. Under such circumstances, it is very important to know dissolution characteristics of the resist film into alkaline developer though the dissolution of exposed area of resist films in alkaline developer to form a pattern is a complex reactive process. In this study, the influence of EUV and KrF exposure on the dissolution behavior of polymer bound PAG and polymer blended PAG was studied in detail using quartz crystal microbalance (QCM) methods. The difference in swelling formation between KrF and EUV exposure was observed. It is likely that difference of reaction mechanism induces the difference of these swelling. Also, it is observed that the swelling of polymer-bound PAG is less than that of polymer blended PAG in both KrF and EUV exposure. This result indicates that polymer-bound PAG suppresses swelling very well and showed an excellent performance. Actually, the developed polymer bound-PAG resist showed an excellent performance (half pitch 50 nm line and space pattern). Thus, polymer bound PAG is one of the promising candidate for 16 nm EUV resist.

Performance of 100-W HVM LPP-EUV source

NASA Astrophysics Data System (ADS)

Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

2015-08-01

At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO2-Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO2 laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, `GL200E'. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO2 laser. The preparation of a high average-power CO2 laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.

Ptychographic imaging with partially coherent plasma EUV sources

NASA Astrophysics Data System (ADS)

Bußmann, Jan; Odstrčil, Michal; Teramoto, Yusuke; Juschkin, Larissa

2017-12-01

We report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

Detection of 17 GHz radio emission from X-ray-bright points

NASA Technical Reports Server (NTRS)

Kundu, M. R.; Shibasaki, K.; Enome, S.; Nitta, N.

1994-01-01

Using observations made with the Nobeyama radio heliograph (NRH) at 17 GHz and the Yohkoh/SXT experiment, we report the first detection of 17 GHz signatures of coronal X-ray-bright points (XBPs). This is also the first reported detection of flaring bright points in microwaves. We have detected four BPs at 17 GHz out of eight identified in SXT data on 1992 July 31, for which we looked for 17 GHz emission. For one XBP located in a quiet mixed-polarity region, the peak times at 17 GHz and X-rays are very similar, and both are long-lasting-about 2 hr in duration. There is a second BP (located near an active region) which is most likely flaring also, but the time profiles in the two spectral domains are not similar. The other two 17 GHz BPs are quiescent with fluctuations superposed upon them. For the quiet region XBP, the gradual, long-lasting, and unpolarized emission suggests that the 17 GHz emission is thermal.

Correlations Between Variations in Solar EUV and Soft X-Ray Irradiance and Photoelectron Energy Spectra Observed on Mars and Earth

NASA Technical Reports Server (NTRS)

Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

2013-01-01

Solar extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F(10.7) index currently used.

Correlations between variations in solar EUV and soft X-ray irradiance and photoelectron energy spectra observed on Mars and Earth

NASA Astrophysics Data System (ADS)

Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

2013-11-01

extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F10.7 index currently used.

Ionization in the local interstellar and intergalactic media

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cheng, K.

1990-01-01

Detailed photoionization calculations for the local interstellar medium (LISM) and the intergalactic medium (IGM) are presented. Constraints in the LISM are imposed by H I column density derived from IUE and Copernicus data toward nearby B stars and hot white dwarfs. The EUV radiation field is modeled including contributions from discrete stellar sources and from a thermal bremsstrahlung-radiative recombination spectrum emitted from the surrounding 10(exp 6) K coronal substrate. Lower limits to the fractional ionization of hydrogen and helium of 0.17 and 0.30 respectively are established. The derived limits have important implications for the interpretation of the H I andmore » He I backscattering results. The high He ionization fraction results primarily from very strong line emission below 500 A originating in the surrounding coronal substrate while the H ionization is dominated by the EUV radiation from the discrete stellar sources. The dual effects of thermal conduction and the EUV spectrum of the 10(exp 6) K plasma on ionization in the cloud skin are explored. The EUV radiation field and Auger ionization have insignificant effects on the resulting ionic column densities of Si IV, C IV, N V and O VI through the cloud skin. Calculations show that the abundances of these species are dominated by collisional ionization in the thermal conduction front. Because of a low charge exchange rate with hydrogen, the ionic column density ratios of N(C III)/N(C II) and N(N II)/N(N I) are dominated by the EUV radiation field in the local interstellar medium. These ratios should be important diagnostics for the EUV radiation field and serve as surrogate indicators of the interstellar He and H ionization fraction respectively. The same photoionization model is applied to the intergalactic medium.« less

Analysis of erythemally effective UV radiation at the Mendel Station, James Ross Island in the period of 2006-2007

NASA Astrophysics Data System (ADS)

Laska, K.; Prosek, P.; Budik, L.; Budikova, M.

2009-04-01

The results of global solar and erythemally effective ultraviolet (EUV) radiation measurements are presented. The radiation data were collected within the period of 2006-2007 at the Czech Antarctic station J. G. Mendel, James Ross Island (63°48'S, 57°53'W). Global solar radiation was measured by a Kipp&Zonen CM11 pyranometer. EUV radiation was measured according to the McKinley and Diffey Erythemal Action Spectrum with a Solar Light broadband UV-Biometer Model 501A. The effects of stratospheric ozone concentration and cloudiness (estimated as cloud impact factor from global solar radiation) on the intensity of incident EUV radiation were calculated by a non-linear regression model. The total ozone content (TOC) and cloud/surface reflectivity derived from satellite-based measurements were applied into the model for elimination of the uncertainties in measured ozone values. There were two input data of TOC used in the model. The first were taken from the Dobson spectrophotometer measurements (Argentinean Antarctic station Marambio), the second was acquired for geographical coordinates of the Mendel Station from the EOS Aura Ozone Monitoring Instrument and V8.5 algorithm. Analysis of measured EUV data showed that variable cloudiness affected rather short-term fluctuations of the radiation fluxes, while ozone declines caused long-term UV radiation increase in the second half of the year. The model predicted about 98 % variability of the measured EUV radiation. The residuals between measured and modeled EUV radiation intensities were evaluated separately for the above-specified two TOC datasets, parts of seasons and cloud impact factor (cloudiness). The mean average prediction error was used for model validation according to the cloud impact factor and satellite-based reflectivity data.

A chain of winking (oscillating) filaments triggered by an invisible extreme-ultraviolet wave

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shen, Yuandeng; Tian, Zhanjun; Zhao, Ruijuan

2014-05-10

Winking (oscillating) filaments have been observed for many years. However, observations of successive winking filaments in one event have not yet been reported. In this paper, we present the observations of a chain of winking filaments and a subsequent jet that are observed right after the X2.1 flare in AR11283. The event also produced an extreme-ultraviolet (EUV) wave that has two components: an upward dome-like wave (850 km s{sup –1}) and a lateral surface wave (554 km s{sup –1}) that was very weak (or invisible) in imaging observations. By analyzing the temporal and spatial relationships between the oscillating filaments andmore » the EUV waves, we propose that all the winking filaments and the jet were triggered by the weak (or invisible) lateral surface EUV wave. The oscillation of the filaments last for two or three cycles, and their periods, Doppler velocity amplitudes, and damping times are 11-22 minutes, 6-14 km s{sup –1}, and 25-60 minutes, respectively. We further estimate the radial component magnetic field and the maximum kinetic energy of the filaments, and they are 5-10 G and ∼10{sup 19} J, respectively. The estimated maximum kinetic energy is comparable to the minimum energy of ordinary EUV waves, suggesting that EUV waves can efficiently launch filament oscillations on their path. Based on our analysis results, we conclude that the EUV wave is a good agent for triggering and connecting successive but separated solar activities in the solar atmosphere, and it is also important for producing solar sympathetic eruptions.« less

SLOW PATCHY EXTREME-ULTRAVIOLET PROPAGATING FRONTS ASSOCIATED WITH FAST CORONAL MAGNETO-ACOUSTIC WAVES IN SOLAR ERUPTIONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo, Y.; Ding, M. D.; Chen, P. F., E-mail: guoyang@nju.edu.cn

2015-08-15

Using the high spatiotemporal resolution extreme ultraviolet (EUV) observations of the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory, we conduct a statistical study of the observational properties of the coronal EUV propagating fronts. We find that it might be a universal phenomenon for two types of fronts to coexist in a large solar eruptive event. It is consistent with the hybrid model of EUV propagating fronts, which predicts that coronal EUV propagating fronts consist of both a fast magneto-acoustic wave and a nonwave component. We find that the morphologies, propagation behaviors, and kinematic features of the two EUVmore » propagating fronts are completely different from each other. The fast magneto-acoustic wave fronts are almost isotropic. They travel continuously from the flaring region across multiple magnetic polarities to global distances. On the other hand, the slow nonwave fronts appear as anisotropic and sequential patches of EUV brightening. Each patch propagates locally in the magnetic domains where the magnetic field lines connect to the bottom boundary and stops at the magnetic domain boundaries. Within each magnetic domain, the velocities of the slow patchy nonwave component are an order of magnitude lower than that of the fast-wave component. However, the patches of the slow EUV propagating front can jump from one magnetic domain to a remote one. The velocities of such a transit between different magnetic domains are about one-third to one-half of those of the fast-wave component. The results show that the velocities of the nonwave component, both within one magnetic domain and between different magnetic domains, are highly nonuniform due to the inhomogeneity of the magnetic field in the lower atmosphere.« less

An extreme ultraviolet spectrometer experiment for the Shuttle Get Away Special Program

NASA Technical Reports Server (NTRS)

Conway, R. R.; Mccoy, R. P.; Meier, R. R.; Mount, G. H.; Prinz, D. K.; Young, J. M.; Carruthers, G. R.

1984-01-01

An extreme ultraviolet (EUV) spectrometer experiment operated successfully during the STS-7 mission in an experiment to measure the global and diurnal variation of the EUV airglow. The spectrometer is an F 3.5 Wadsworth mount with mechanical collimator, a 75 x 75 mm grating, and a bare microchannel plate detector providing a spectral resolution of 7 X FWHM. Read-out of the signal is through discrete channels or resistive anode techniques. The experiment includes a microcomputer, 20 Mbit tape recorder, and a 28V, 40 Ahr silver-zinc battery. It is the first GAS payload to use an opening door. The spectrometer's 0.1 x 4.2 deg field of view is pointed vertically out of the shuttle bay. During the STS-7 flight data were acquired continuously for a period of 5 hours and 37 minutes, providing spectra of the 570 A to 850 A wavelength region of the airglow. Five diurnal cycles of the 584 A emission of neutral helium and the 834 A emission of ionized atomic oxygen were recorded. The experiment also recorded ion events and pressure pulses associated with thruster firings. The experiment is to fly again on Mission 41-F.

Stellar Rubella: Starspots on F, G and K Stars of Different Ages and Rotation Periods

NASA Astrophysics Data System (ADS)

Guinan, E. F.; Dewarf, L. E.; Messina, S.; McCook, G. P.

1995-05-01

We present high precision photoelectric photometry of a sample of bright, single F, G, and K- type main-sequence and subgiant stars. Several of the stars are members of clusters or moving groups and thus have well determined ages. The majority of the stars are main-sequence to subgiant G-types stars that range in age from 70 Myr to 10 Gyr with directly measured rotation periods from 2.7 days up to 40-50 days. The observations have been carried out with Automatic Photometric Telescopes (APTs) located on Mt Hopkins, Arizona beginning in 1988; standard UBVRI \\ or uvby \\ filters were used. As expected, the youngest, fastest rotating stars in the sample typically have the largest, rotationally modulated starspot light variations. Some of the stars show relatively rapid changes in their light curves that are explained by differential rotation of the starspot groups. In addition, some of the stars that have been observed over several years show long-term, seasonal trends in their mean brightness levels that most likely arise from starspot cycles. The starspot properties (areal coverage, distribution, and temperature) are determined from the modelling of the multiwavelength light curves. For certain stars, comparisons of these photospheric starspots properties to their corresponding chromospheric, transition region, and coronal activity indicators obtained in the UV, EUV \\ and X-ray are presented and discussed. Analogies are also made to the magnetic properties of the Sun. This research is supported by NSF AST 86-16362, NASA NAG5-2160, and NAG5-2494.

Extreme ultraviolet patterning of tin-oxo cages

NASA Astrophysics Data System (ADS)

Haitjema, Jarich; Zhang, Yu; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Brouwer, Albert M.

2017-07-01

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages. These cage molecules were already known to function as a negative tone photoresist for EUV radiation, but in this work, we significantly optimized their performance. Our results show that sensitivity and resolution are only meaningful photoresist parameters if the process conditions are optimized. We focus on contrast curves of the materials using large area EUV exposures and patterning of the cages using EUV interference lithography. It is shown that baking steps, such as postexposure baking, can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. A layer thickness increase reduced the necessary dose to induce a solubility change but decreased the patterning quality. The patterning experiments were affected by minor changes in processing conditions such as an increased rinsing time. In addition, we show that the anions of the cage can influence the sensitivity and quality of the patterning, probably through their effect on physical properties of the materials.

EUV process improvement with novel litho track hardware

NASA Astrophysics Data System (ADS)

Stokes, Harold; Harumoto, Masahiko; Tanaka, Yuji; Kaneyama, Koji; Pieczulewski, Charles; Asai, Masaya

2017-03-01

Currently, there are many developments in the field of EUV lithography that are helping to move it towards increased HVM feasibility. Targeted improvements in hardware design for advanced lithography are of interest to our group specifically for metrics such as CD uniformity, LWR, and defect density. Of course, our work is focused on EUV process steps that are specifically affected by litho track performance, and consequently, can be improved by litho track design improvement and optimization. In this study we are building on our experience to provide continual improvement for LWR, CDU, and Defects as applied to a standard EUV process by employing novel hardware solutions on our SOKUDO DUO coat develop track system. Although it is preferable to achieve such improvements post-etch process we feel, as many do, that improvements after patterning are a precursor to improvements after etching. We hereby present our work utilizing the SOKUDO DUO coat develop track system with an ASML NXE:3300 in the IMEC (Leuven, Belgium) cleanroom environment to improve aggressive dense L/S patterns.

The Nearest Neutron Stars

NASA Technical Reports Server (NTRS)

Halpern, Jules P.

1996-01-01

Extreme Ultraviolet Explorer (EUVE) satellite observations of the Pulsar PSR J0437-4715, the Seyfert Galaxy RX J0437.4-4711, and the Geminga Pulsar are reported on. The main purpose of the PSR J0437-4715 investigation was to examine its soft X-ray flux. The 20 day EUVE observation of RX J0437.4-4711 constitutes a uniformly sampled soft X-ray light curve of a highly variable Seyfert galaxy whose power spectrum can be examined on timescales from 3 hrs. to several days. A unique aspect of the EUVE observation of RX J0437.4-4711 is its long light curve which we have used to measure the power spectrum of soft X-ray variability at low frequencies. Approximately 2100 counts were detected for the Geminga pulsar in a period of 251,000 s by the EUVE Deep Survey instrument. Geminga presents an unusually difficult problem because its multicomponent X-ray spectrum and pulse profile are indicative of a complex distribution of surface emission, and possibly a contribution from nonthermal emission as well.

Ultimate waveform reproducibility of extreme-ultraviolet pulses by high-harmonic generation in quartz

NASA Astrophysics Data System (ADS)

Garg, M.; Kim, H. Y.; Goulielmakis, E.

2018-05-01

Optical waveforms of light reproducible with subcycle precision underlie applications of lasers in ultrafast spectroscopies, quantum control of matter and light-based signal processing. Nonlinear upconversion of optical pulses via high-harmonic generation in gas media extends these capabilities to the extreme ultraviolet (EUV). However, the waveform reproducibility of the generated EUV pulses in gases is inherently sensitive to intensity and phase fluctuations of the driving field. We used photoelectron interferometry to study the effects of intensity and carrier-envelope phase of an intense single-cycle optical pulse on the field waveform of EUV pulses generated in quartz nanofilms, and contrasted the results with those obtained in gas argon. The EUV waveforms generated in quartz were found to be virtually immune to the intensity and phase of the driving field, implying a non-recollisional character of the underlying emission mechanism. Waveform-sensitive photonic applications and precision measurements of fundamental processes in optics will benefit from these findings.

The Solar Flux Dependence of Ionospheric 150 km Radar Echoes and Implications

NASA Astrophysics Data System (ADS)

Patra, A. K.; Pavan Chaitanya, P.; St.-Maurice, J.-P.; Otsuka, Y.; Yokoyama, T.; Yamamoto, M.

2017-11-01

Radar echoes from the daytime equatorial ionospheric F1 region, popularly known as "150 km echoes," have challenged ionospheric plasma physicists for several decades. Recent theoretical simulations showed that enhanced photoelectron fluxes can amplify the amplitude of plasma waves, generating spectra similar to those of the radar echoes, implying that larger solar fluxes should produce more frequent and stronger 150 km echoes. Inspired by this proposal, we studied the occurrence and intensity dependence of the echoes on the EUV flux observed by SOHO over several years. The occurrence and intensity of the echoes were found to have an inverse relationship with this EUV flux measurement. The multiyear trend is independent of the variability often observed over successive days with nearly identical EUV fluxes. These results imply that the relationship between the echoes and EUV flux is more complex. We propose that gravity waves modulate the amplitude of 150 km echoes through changes in the variations in plasma density and photoelectron fluxes associated with the gravity wave-induced neutral density modulations.

Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costs

NASA Astrophysics Data System (ADS)

Keens, Simon; Rossa, Bernhard; Frei, Marcel

2016-03-01

As the semiconductor industry proceeds to develop ever better sources of extreme ultraviolet (EUV) light for photolithography applications, two distinct technologies have come to prominence: Tin-plasma and free electron laser (FEL) sources. Tin plasma sources have been in development within the industry for many years, and have been widely reported. Meanwhile, FELs represent the most promising alternative to create high power EUV frequencies and, while tin-plasma source development has been ongoing, such lasers have been continuously developed by academic institutions for use in fundamental research programmes in conjunction with universities and national scientific institutions. This paper follows developments in the field of academic FELs, and presents information regarding novel technologies, specifically in the area of RF design strategy, that may be incorporated into future industrial FEL systems for EUV lithography in order to minimize the necessary investment and operational costs. It goes on to try to assess the cost-benefit of an alternate RF design strategy, based upon previous studies.

The future of EUV lithography: enabling Moore's Law in the next decade

NASA Astrophysics Data System (ADS)

Pirati, Alberto; van Schoot, Jan; Troost, Kars; van Ballegoij, Rob; Krabbendam, Peter; Stoeldraijer, Judon; Loopstra, Erik; Benschop, Jos; Finders, Jo; Meiling, Hans; van Setten, Eelco; Mika, Niclas; Dredonx, Jeannot; Stamm, Uwe; Kneer, Bernhard; Thuering, Bernd; Kaiser, Winfried; Heil, Tilmann; Migura, Sascha

2017-03-01

While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of this scanner, targeting a resolution of 8nm, is to extend Moore's law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the required Numerical Aperture; this lens will be paired with new, faster stages and more accurate sensors enabling Moore's law economical requirements, as well as the tight focus and overlay control needed for future process nodes. The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling, and possibly in the metrology concepts. Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution. This paper presents an overview of the key technology innovations and infrastructure requirements for the next generation EUV systems.

The constitution of the atmospheric layers and the extreme ultraviolet spectrum of hot hydrogen-rich white dwarfs

NASA Technical Reports Server (NTRS)

Vennes, Stephane

1992-01-01

An analysis is presented of the atmospheric properties of hot, H-rich, DA white dwarfs that is based on optical, UV, and X-ray observations aimed at predicting detailed spectral properties of these stars in the range 80-800 A. The divergences between observations from a sample of 15 hot DA white dwarfs emitting in the EUV/soft X-ray range and pure H synthetic spectra calculated from a grid of model atmospheres characterized by Teff and g are examined. Seven out of 15 DA stars are found to consistently exhibit pure hydrogen atmospheres, the remaining seven stars showing inconsistency between FUV and EUV/soft X-ray data that can be explained by the presence of trace EUV/soft X-ray absorbers. Synthetic data are computed assuming two other possible chemical structures: photospheric traces of radiatively levitated heavy elements and a stratified hydrogen/helium distribution. Predictions about forthcoming medium-resolution observations of the EUV spectrum of selected hot H-rich white dwarfs are made.

Materials Properties and Solvated Electron Dynamics of Isolated Nanoparticles and Nanodroplets Probed with Ultrafast Extreme Ultraviolet Beams.

PubMed

Ellis, Jennifer L; Hickstein, Daniel D; Xiong, Wei; Dollar, Franklin; Palm, Brett B; Keister, K Ellen; Dorney, Kevin M; Ding, Chengyuan; Fan, Tingting; Wilker, Molly B; Schnitzenbaumer, Kyle J; Dukovic, Gordana; Jimenez, Jose L; Kapteyn, Henry C; Murnane, Margaret M

2016-02-18

We present ultrafast photoemission measurements of isolated nanoparticles in vacuum using extreme ultraviolet (EUV) light produced through high harmonic generation. Surface-selective static EUV photoemission measurements were performed on nanoparticles with a wide array of compositions, ranging from ionic crystals to nanodroplets of organic material. We find that the total photoelectron yield varies greatly with nanoparticle composition and provides insight into material properties such as the electron mean free path and effective mass. Additionally, we conduct time-resolved photoelectron yield measurements of isolated oleylamine nanodroplets, observing that EUV photons can create solvated electrons in liquid nanodroplets. Using photoemission from a time-delayed 790 nm pulse, we observe that a solvated electron is produced in an excited state and subsequently relaxes to its ground state with a lifetime of 151 ± 31 fs. This work demonstrates that femotosecond EUV photoemission is a versatile surface-sensitive probe of the properties and ultrafast dynamics of isolated nanoparticles.

Negative-tone imaging with EUV exposure toward 13nm hp

NASA Astrophysics Data System (ADS)

Tsubaki, Hideaki; Nihashi, Wataru; Tsuchihashi, Toru; Yamamoto, Kei; Goto, Takahiro

2016-03-01

Negative-tone imaging (NTI) with EUV exposure has major advantages with respect to line-width roughness (LWR) and resolution due in part to polymer swelling and favorable dissolution mechanics. In NTI process, both resist and organic solvents play important roles in determining lithography performances. The present study describes novel chemically amplified resist materials based on NTI technology with EUV using a specific organic solvents. Lithographic performances of NTI process were described in this paper under exposures using ASML NXE:3300 EUV scanner at imec. It is emphasized that 14 nm hp was nicely resolved under exposure dose of 37 mJ/cm2 without any bridge and collapse, which are attributed to the low swelling character of NTI process. Although 13 nm hp resolution was potentially obtained, a pattern collapse still restricts its resolution in case coating resist film thickness is 40 nm. Dark mask limitation due mainly to mask defectivity issue makes NTI with EUV favorable approach for printing block mask to produce logic circuit. A good resolution of CD-X 21 nm/CD-Y 32 nm was obtained for block mask pattern using NTI with usable process window and dose of 49 mJ/cm2. Minimum resolution now reaches CD-X 17 nm / CD-Y 23 nm for the block. A 21 nm block mask resolution was not affected by exposure dose and explored toward low dose down to 18 mJ/cm2 by reducing quencher loading. In addition, there was a negligible amount of increase in LCDU for isolated dot pattern when decreasing exposure dose from 66 mJ/cm2 to 24 mJ/cm2. On the other hand, there appeared tradeoff relationship between LCDU and dose for dense dot pattern, indicating photon-shot noise restriction, but strong dependency on patterning features. Design to improve acid generation efficiency was described based on acid generation mechanism in traditional chemically amplified materials which contains photo-acid generator (PAG) and polymer. Conventional EUV absorber comprises of organic compounds is expected to have 1.6 times higher EUV absorption than polyhydroxystyrene based on calculation. However, observed value of acid amount was comparable or significantly worse than polyhydroxystyrene.

Evaluation results of a new EUV reticle pod based on SEMI E152

NASA Astrophysics Data System (ADS)

Ota, Kazuya; Yonekawa, Masami; Taguchi, Takao; Suga, Osamu

2010-04-01

To protect the reticle during shipping, storage and tool handling, various reticle pod concepts have been proposed and evaluated in the last 10 years. MIRAI-Selete has been developing EUV reticle handling technology and evaluating EUV reticle pods designed using "Dual Pod Concept" for four years. The concept was jointly proposed by Canon and Nikon at the EUV mask technology and standards workshop at Miyazaki in November 2004; a mask is doubly protected by an inner pod and an outer pod and the mask is carried into an exposure tool with the inner pod. Canon, Nikon and Entegris have started collaboration in 2005 and developed three types of EUV pod prototypes, alpha, beta and gamma. The gamma pods were evaluated by MIRAI-Selete and the superiority of the dual pod concept has been verified with many experimental data on shipping, storage and tool handling. The dual pod concept was standardized as SEMI E152-0709 "Mechanical Specification of EUV Pods for 150mm EUVL Reticles" in 2009. Canon, Nikon and Entegris have developed a new pod design compatible with SEMI E152; it has a Type A inner baseplate for uses with EUV exposure tools. The baseplate has two alignment windows, a window for a data matrix symbol and five pockets as the front edge grip exclusion volumes. In addition to the new features, there are some differences between the new SEMI compliant pod design and the former design "CNE-gamma", e.g. the material of the inner cover was changed to metal to reduce outgassing rate and the gap between the reticle and the side supports were widened to satisfy a requirement of the standard. MIRAI-Selete has evaluated the particle protective capability of the new SEMI compliant pods "cnPod" during shipping, storage and tool handling in vacuum and found the "cnPod" has the excellent particle protective capability and the dual pod concept can be used not only for EUVL pilot line but also for EUVL high volume manufacturing.

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

NASA Astrophysics Data System (ADS)

Blanco Carballo, V. M.; Bekaert, J.; Mao, M.; Kutrzeba Kotowska, B.; Larivière, S.; Ciofi, I.; Baert, R.; Kim, R. H.; Gallagher, E.; Hendrickx, E.; Tan, L. E.; Gillijns, W.; Trivkovic, D.; Leray, P.; Halder, S.; Gallagher, M.; Lazzarino, F.; Paolillo, S.; Wan, D.; Mallik, A.; Sherazi, Y.; McIntyre, G.; Dusa, M.; Rusu, P.; Hollink, T.; Fliervoet, T.; Wittebrood, F.

2017-03-01

This paper summarizes findings on the iN7 platform (foundry N5 equivalent) for single exposure EUV (SE EUV) of M1 and M2 BEOL layers. Logic structures within these layers have been measured after litho and after etch, and variability was characterized both with conventional CD-SEM measurements as well as Hitachi contouring method. After analyzing the patterning of these layers, the impact of variability on potential interconnect reliability was studied by using MonteCarlo and process emulation simulations to determine if current litho/etch performance would meet success criteria for the given platform design rules.

Performance of multilayer coated diffraction gratings in the EUV

NASA Technical Reports Server (NTRS)

Keski-Kuha, Ritva A. M.; Thomas, Roger J.; Gum, Jeffrey S.; Condor, Charles E.

1990-01-01

The effect of multilayer coating application on the performance of a diffraction grating in the EUV spectral region was evaluated by examining the performance of a 3600-line/mm and a 1200-line/mm replica blazed gratings, designed for operation in the 300-A spectral region in first order. A ten-layer IrSi multilayer optimized for 304 A was deposited using electron-beam evaporation. The grating efficiency was measured on the SURF II calibration beamline in a chamber designed for calibrating the solar EUV rocket telescope and spectrograph multilayer coatings. A significant (by a factor of about 7) enhancement in grating efficiency in the 300-A region was demonstrated.

Responses of the Jovian Atmosphere to Cometary Particles and Photon Impacts

NASA Technical Reports Server (NTRS)

Dalgarno, A.

1998-01-01

Spectra of soft x-ray and EUV emissions of oxygen ions, precipitating into the Jovian atmosphere, are calculated, taking into account the dynamical character of the energy and charge distributions of the ions as they propagate. Monte-Carlo simulations are performed using experimental and theoretical cross sections of ion collisions with the atmospheric gases. The numbers of x-ray and EUV photons produced per precipitating oxygen ion are calculated as functions of the initial ion energy and charge. The energy and charge distribution functions are used to evaluate the intensities of characteristic x-ray and EUV spectral emission lines of oxygen ions in the Jovian aurora.

ROSAT EUV and soft X-ray studies of atmospheric composition and structure in G191-B2B

NASA Technical Reports Server (NTRS)

Barstow, M. A.; Fleming, T. A.; Finley, D. S.; Koester, D.; Diamond, C. J.

1993-01-01

Previous studies of the hot DA white dwarf GI91-B2B have been unable to determine whether the observed soft X-ray and EUV opacity arises from a stratified hydrogen and helium atmosphere or from the presence of trace metals in the photosphere. New EUV and soft X-ray photometry of this star, made with the ROSAT observatory, when analyzed in conjunction with the earlier data, shows that the stratified models cannot account for the observed fluxes. Consequently, we conclude that trace metals must be a substantial source of opacity in the photosphere of G191-B2B.

Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy.

PubMed

Schriever, G; Mager, S; Naweed, A; Engel, A; Bergmann, K; Lebert, R

1998-03-01

Extended ultraviolet (EUV) emission characteristics of a laser-produced lithium plasma are determined with regard to the requirements of x-ray photoelectron spectroscopy. The main features of interest are spectral distribution, photon flux, bandwidth, source size, and emission duration. Laser-produced lithium plasmas are characterized as emitters of intense narrow-band EUV radiation. It can be estimated that the lithium Lyman-alpha line emission in combination with an ellipsoidal silicon/molybdenum multilayer mirror is a suitable EUV source for an x-ray photoelectron spectroscopy microscope with a 50-meV energy resolution and a 10-mum lateral resolution.

EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment

NASA Astrophysics Data System (ADS)

Yaegashi, Hidetami; Koike, Kyohei; Fonseca, Carlos; Yamashita, Fumiko; Kaushik, Kumar; Morikita, Shinya; Ito, Kiyohito; Yoshimura, Shota; Timoshkov, Vadim; Maslow, Mark; Jee, Tae Kwon; Reijnen, Liesbeth; Choi, Peter; Feng, Mu; Spence, Chris; Schoofs, Stijn

2018-03-01

Extreme UV(EUV) technology must be potential solution for sustainable scaling, and its adoption in high volume manufacturing(HVM) is getting realistic more and more. This technology has a wide capability to mitigate various technical problem in Multi-patterning (LELELE) for via hole patterning with 193-i. It induced local pattern fidelity error such like CDU, CER, Pattern placement error. Exactly, EUV must be desirable scaling-driving tool, however, specific technical issue, named RLS (Resolution-LER-Sensitivity) triangle, obvious remaining issue. In this work, we examined hole patterning sensitizing (Lower dose approach) utilizing hole patterning restoration technique named "CD-Healing" as post-Litho. treatment.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source.

PubMed

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 microm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2 x 10(11) Wcm(2) with a spot diameter of 175 microm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2×1011 W/cm2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Microchannel plate EUV detectors for the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Siegmund, O. H. W.; Malina, R. F.; Coburn, K.; Werthimer, D.

1984-01-01

The design and operating characteristics of the prototype imaging microchannel plate (MCP) detector for the Extreme Ultraviolet Explorer (EUVE) Satellite are discussed. It is shown that this detector has achieved high position resolution performance (greater than 512 x 512 pixels) and has low (less than one percent) image distortion. In addition, the channel plate scheme used has tight pulse height distributions (less than 40 percent FWHM) for UV radiation and displays low (less than 0.2 cnt/sq cm-s) dark background counting rates. Work that has been done on EUV filters in relation to the envisaged filter and photocathode complement is also described.

A new evaluation method of electron optical performance of high beam current probe forming systems.

PubMed

Fujita, Shin; Shimoyama, Hiroshi

2005-10-01

A new numerical simulation method is presented for the electron optical property analysis of probe forming systems with point cathode guns such as cold field emitters and the Schottky emitters. It has long been recognized that the gun aberrations are important parameters to be considered since the intrinsically high brightness of the point cathode gun is reduced due to its spherical aberration. The simulation method can evaluate the 'threshold beam current I(th)' above which the apparent brightness starts to decrease from the intrinsic value. It is found that the threshold depends on the 'electron gun focal length' as well as on the spherical aberration of the gun. Formulas are presented to estimate the brightness reduction as a function of the beam current. The gun brightness reduction must be included when the probe property (the relation between the beam current l(b) and the probe size on the sample, d) of the entire electron optical column is evaluated. Formulas that explicitly consider the gun aberrations into account are presented. It is shown that the probe property curve consists of three segments in the order of increasing beam current: (i) the constant probe size region, (ii) the brightness limited region where the probe size increases as d approximately I(b)(3/8), and (iii) the angular current intensity limited region in which the beam size increases rapidly as d approximately I(b)(3/2). Some strategies are suggested to increase the threshold beam current and to extend the effective beam current range of the point cathode gun into micro ampere regime.

SOLAR - ASTRONOMY

NASA Image and Video Library

1973-09-09

S73-33788 (10 June 1973) --- The solar eruption of June 10, 1973, is seen in this spectroheliogram obtained during the first manned Skylab mission (Skylab 2), with the SO82A experiment, an Apollo Telescope Mount (ATM) component covering the wavelength region from 150 to 650 angstroms (EUV). The solid disk in the center was produced from 304 angstrom ultraviolet light from He + ions. At the top of this image a great eruption is visible extending more than one-third of a solar radius from the sun's surface. This eruption preceded the formation of an enormous coronal bubble which extended a distance of several radii from the sun's surface, and which was observed with the coronagraph aboard Skylab. In contrast, the Fe XV image at 285 angstrom just to the right of the 304 angstrom image does not show this event. Instead, it shows the bright emission from a magnetic region in the lower corona. In this picture, solar north is to the right, and east is up. The wavelength scale increases to the left. The U.S. Naval Research Laboratory is principal investigator in charge of the SO82 experiment. Photo credit: NASA

A volume-limited ROSAT survey of extreme ultraviolet emission from all nondegenerate stars within 10 parsecs

NASA Technical Reports Server (NTRS)

Wood, Brian E.; Brown, Alexander; Linsky, Jeffrey L.; Kellett, Barry J.; Bromage, Gordon E.; Hodgkin, Simon T.; Pye, John P.

1994-01-01

We report the results of a volume-limited ROSAT Wide Field Camera (WFC) survey of all nondegenerate stars within 10 pc. Of the 220 known star systems within 10 pc, we find that 41 are positive detections in at least one of the two WFC filter bandpasses (S1 and S2), while we consider another 14 to be marginal detections. We compute X-ray luminosities for the WFC detections using Einstein Imaging Proportional Counter (IPC) data, and these IPC luminosities are discussed along with the WFC luminosities throughout the paper for purposes of comparison. Extreme ultraviolet (EUV) luminosity functions are computed for single stars of different spectral types using both S1 and S2 luminosities, and these luminosity functions are compared with X-ray luminosity functions derived by previous authors using IPC data. We also analyze the S1 and S2 luminosity functions of the binary stars within 10 pc. We find that most stars in binary systems do not emit EUV radiation at levels different from those of single stars, but there may be a few EUV-luminous multiple-star systems which emit excess EUV radiation due to some effect of binarity. In general, the ratio of X-ray luminosity to EUV luminosity increases with increasing coronal emission, suggesting that coronally active stars have higher coronal temperatures. We find that our S1, S2, and IPC luminosities are well correlated with rotational velocity, and we compare activity-rotation relations determined using these different luminosities. Late M stars are found to be significantly less luminous in the EUV than other late-type stars. The most natural explanation for this results is the concept of coronal saturation -- the idea that late-type stars can emit only a limited fraction of their total luminosity in X-ray and EUV radiation, which means stars with very low bolometric luminosities must have relatively low X-ray and EUV luminosities as well. The maximum level of coronal emission from stars with earlier spectral types is studied also. To understand the saturation levels for these stars, we have compiled a large number of IPC luminosities for stars with a wide variety of spectral types and luminosity classes. We show quantitatively that if the Sun were completely covered with X-ray-emitting coronal loops, it would be near the saturation limit implied by this compilation, supporting the idea that stars near upper limits in coronal activity are completely covered with active regions.

Response of the upper atmosphere to variations in the solar soft x-ray irradiance. Ph.D. Thesis

NASA Technical Reports Server (NTRS)

Bailey, Scott Martin

1995-01-01

Terrestrial far ultraviolet (FUV) airglow emissions have been suggested as a means for remote sensing the structure of the upper atmosphere. The energy which leads to the excitation of FUV airglow emissions is solar irradiance at extreme ultraviolet (EUV) and soft x-ray wavelengths. Solar irradiance at these wavelengths is known to be highly variable; studies of nitric oxide (NO) in the lower thermosphere have suggested a variability of more than an order of magnitude in the solar soft x-ray irradiance. To properly interpret the FUV airflow, the magnitude of the solar energy deposition must be known. Previous analyses have used the electron impact excited Lyman-Birge-Hopfield (LBH) bands of N2 to infer the flux of photoelectrons in the atmosphere and thus to infer the magnitude of the solar irradiance. This dissertation presents the first simultaneous measurements of the FUV airglow, the major atmospheric constituent densities, and the solar EUV and soft x-ray irradiances. The measurements were made on three flights of an identical sounding rocket payload at different levels of solar activity. The linear response in brightness of the LBH bands to variations in solar irradiance is demonstrated. In addition to the N2 LBH bands, atomic oxygen lines at 135.6 and 130.4 nm are also studied. Unlike the LBH bands, these emissions undergo radiative transfer effects in the atmosphere. The OI emission at 135.6 nm is found to be well modeled using a radiative transfer calculation and the known excitation processes. Unfortunately, the assumed processes leading to OI 130.4 nm excitation are found to be insufficient to reproduce the observed variability of this emission. Production of NO in the atmosphere is examined; it is shown that a lower than previously reported variability in the solar soft x-ray irradiance is required to explain the variability of NO.

ERUPTING FILAMENTS WITH LARGE ENCLOSING FLUX TUBES AS SOURCES OF HIGH-MASS THREE-PART CMEs, AND ERUPTING FILAMENTS IN THE ABSENCE OF ENCLOSING FLUX TUBES AS SOURCES OF LOW-MASS UNSTRUCTURED CMEs

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hutton, Joe; Morgan, Huw, E-mail: joh9@aber.ac.uk

2015-11-01

The 3-part appearance of many coronal mass ejections (CMEs) arising from erupting filaments emerges from a large magnetic flux tube structure, consistent with the form of the erupting filament system. Other CMEs arising from erupting filaments lack a clear 3-part structure and reasons for this have not been researched in detail. This paper aims to further establish the link between CME structure and the structure of the erupting filament system and to investigate whether CMEs which lack a 3-part structure have different eruption characteristics. A survey is made of 221 near-limb filament eruptions observed from 2013 May 03 to 2014more » June 30 by Extreme UltraViolet (EUV) imagers and coronagraphs. Ninety-two filament eruptions are associated with 3-part structured CMEs, 41 eruptions are associated with unstructured CMEs. The remaining 88 are categorized as failed eruptions. For 34% of the 3-part CMEs, processing applied to EUV images reveals the erupting front edge is a pre-existing loop structure surrounding the filament, which subsequently erupts with the filament to form the leading bright front edge of the CME. This connection is confirmed by a flux-rope density model. Furthermore, the unstructured CMEs have a narrower distribution of mass compared to structured CMEs, with total mass comparable to the mass of 3-part CME cores. This study supports the interpretation of 3-part CME leading fronts as the outer boundaries of a large pre-existing flux tube. Unstructured (non 3-part) CMEs are a different family to structured CMEs, arising from the eruption of filaments which are compact flux tubes in the absence of a large system of enclosing closed field.« less

Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Grunow, Philip A.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.

2001-08-01

Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was deposited onto Mo/Si multilayer mirror (MLM) samples when hydrocarbon vapors where intentionally introduced into the MLM test chamber in the presence of EUV at 13.44 nm (92.3eV). The carbon deposits so formed were removed by molecular oxygen + EUV. The MLM reflectivities and photoemission were measured in-situ during these carbon deposition and cleaning procedures. Auger Electron Spectroscopy (AES) sputter-through profiling of the samples was performed after experimental runs to help determine C layer thickness and the near-surface compositional-depth profiles of all samples studied. EUV powers were varied from ~0.2mW/mm2 to 3mW/mm2(at 13.44 nm) during both deposition and cleaning experiments and the oxygen pressure ranged from ~5x10-5 to 5x10-4 Torr during the cleaning experiments. C deposition rates as high as ~8nm/hr were observed, while cleaning rates as high as ~5nm/hr could be achieved when the highest oxygen pressure were used. A limited set of experiments involving intentional oxygen-only exposure of the MLM samples showed that slow oxidation of the MLM surface could occur.

Observations of X-ray and EUV fluxes during X-class solar flares and response of upper ionosphere

NASA Astrophysics Data System (ADS)

Mahajan, K. K.; Lodhi, Neelesh K.; Upadhayaya, Arun K.

2010-12-01

Most studies dealing with solar flare effects in the upper ionosphere, where ionization is caused by EUV photons, have been based upon X-ray fluxes measured by the SOLRAD and GOES series of satellites. To check the validity of such studies, we compare simultaneous observations of GOES X-ray fluxes and SOHO EUV fluxes for 10 X-class solar flares which occurred during the maximum phase of sunspot cycle 23. These include the greatest flare of 4 November 2003, the fourth greatest flare of 28 October 2003 and the 14 July 2000 Bastille Day flare. We find that the peak intensities of the X-ray and EUV fluxes for these flares are poorly correlated, and this poor correlation is again seen when larger data containing 70 X-class flares, which occurred during the period January 1996 to December 2006, are examined. However, this correlation improves vastly when the central meridian distance (CMD) of the flare location is taken into account. We also study the response of the upper ionosphere to these fluxes by using the midday total electron content (TEC), observed for these flares by Liu et al. (2006). We find that peak enhancement in TEC is highly correlated with peak enhancement in EUV flux. The correlation, though poor with the X-ray flux, improves greatly when the CMD of flare location is considered.

Efficient high-harmonic generation from a stable and compact ultrafast Yb-fiber laser producing 100 μJ, 350 fs pulses based on bendable photonic crystal fiber

NASA Astrophysics Data System (ADS)

Feehan, James S.; Price, Jonathan H. V.; Butcher, Thomas J.; Brocklesby, William S.; Frey, Jeremy G.; Richardson, David J.

2017-01-01

The development of an Yb3+-fiber-based chirped-pulse amplification system and the performance in the generation of extreme ultraviolet (EUV) radiation by high-harmonic generation is reported. The fiber laser produced 100 μJ, 350 fs output pulses with diffraction-limited beam quality at a repetition rate of 16.7 kHz. The system used commercial single-mode, polarization maintaining fiber technology. This included a 40 μm core, easily packaged, bendable final amplifier fiber in order to enable a compact system, to reduce cost, and provide reliable and environmentally stable long-term performance. The system enabled the generation of 0.4 μW of EUV at wavelengths between 27 and 80 nm with a peak at 45 nm using xenon gas. The EUV flux of 1011 photons per second for a driving field power of 1.67 W represents state-of-the-art generation efficiency for single-fiber amplifier CPA systems, corresponding to a maximum calculated energy conversion efficiency of 2.4 × 10-7 from the infrared to the EUV. The potential for high average power operation at increased repetition rates and further suggested technical improvements are discussed. Future applications could include coherent diffractive imaging in the EUV, and high-harmonic spectroscopy.

Investigation of contamination of thin-film aluminum filters by MMH-NTO plumes exposed to UV radiation

NASA Astrophysics Data System (ADS)

Gupta, Vaibhav; Wieman, Seth; Didkovsky, Leonid; Haiges, Ralf; Yao, Yuhan; Wu, Wei; Gruntman, Mike; Erwin, Dan

2015-09-01

Thin-film aluminum filters degrade in space with significant reduction of their Extreme Ultraviolet (EUV) transmission. This degradation was observed on the EUV Spectrophotometer (ESP) onboard the Solar Dynamics Observatory's EUV Variability Experiment and the Solar EUV Monitor (SEM) onboard the Solar and Heliospheric Observatory. One of the possible causes for deterioration of such filters over time is contamination of their surfaces from plumes coming from periodic firing of their satellite's Monomethylhydrazine (MMH) - Nitrogen Tetroxide (NTO) thrusters. When adsorbed by the filters, the contaminant molecules are exposed to solar irradiance and could lead to two possible compositions. First, they could get polymerized leading to a permanent hydrocarbon layer buildup on the filter's surface. Second, they could accelerate and increase the depth of oxidation into filter's bulk aluminum material. To study the phenomena we experimentally replicate contamination of such filters in a simulated environment by MMH-NTO plumes. We apply, Scanning Electron Microscopy and X-Ray photoelectron spectroscopy to characterize the physical and the chemical changes on these contaminated sample filter surfaces. In addition, we present our first analysis of the effects of additional protective layer coatings based on self-assembled carbon monolayers for aluminum filters. This coverage is expected to significantly decrease their susceptibility to contamination and reduce the overall degradation of filter-based EUV instruments over their mission life.

Emission spectra of photoionized plasmas induced by intense EUV pulses: Experimental and theoretical investigations

NASA Astrophysics Data System (ADS)

Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemysław; Jarocki, Roman; Fiedorowicz, Henryk

2017-03-01

Experimental measurements and numerical modeling of emission spectra in photoionized plasma in the ultraviolet and visible light (UV/Vis) range for noble gases have been investigated. The photoionized plasmas were created using laser-produced plasma (LPP) extreme ultraviolet (EUV) source. The source was based on a gas puff target; irradiated with 10ns/10J/10Hz Nd:YAG laser. The EUV radiation pulses were collected and focused using grazing incidence multifoil EUV collector. The laser pulses were focused on a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Irradiation of gases resulted in a formation of low temperature photoionized plasmas emitting radiation in the UV/Vis spectral range. Atomic photoionized plasmas produced this way consisted of atomic and ionic with various ionization states. The most dominated observed spectral lines originated from radiative transitions in singly charged ions. To assist in a theoretical interpretation of the measured spectra, an atomic code based on Cowan's programs and a collisional-radiative PrismSPECT code have been used to calculate the theoretical spectra. A comparison of the calculated spectral lines with experimentally obtained results is presented. Electron temperature in plasma is estimated using the Boltzmann plot method, by an assumption that a local thermodynamic equilibrium (LTE) condition in the plasma is validated in the first few ionization states. A brief discussion for the measured and computed spectra is given.

High Resolution Observations and Modeling of Small-Scale Solar Magnetic Elements

NASA Technical Reports Server (NTRS)

Berger, Thomas E.

2001-01-01

This research contract investigating the radiative transfer and dynamic physics of the smallest observable magnetic structures in the solar photosphere. Due to the lack of a high-resolution visible light satellite instrument for solar studies, all data were acquired using ground-based instrumentation. The primary goal of the investigation was to understand the formation and evolution of "G-band bright points" in relation to the associated magnetic elements. G-band bright points are small (on the order of 100 kin or less in diameter) bright signatures associated with magnetic flux elements in the photosphere. They are seen in the A2A-X2 4308 A molecular bandhead of the CH radical ill the solar spectrum and offer the highest spatial resolution and highest contrast "tracers" of small magnetic structure on the Sun.

Intense X-ray and EUV light source

DOEpatents

Coleman, Joshua; Ekdahl, Carl; Oertel, John

2017-06-20

An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.

Prototype through-pellicle coherent imaging using a 30nm tabletop EUV source

NASA Astrophysics Data System (ADS)

Bevis, Charles S.; Karl, Robert M.; Wang, Bin; Esashi, Yuka; Tanksalvala, Michael; Porter, Christina L.; Johnsen, Peter; Adams, Daniel E.; Murnane, Margaret M.; Kapteyn, Henry C.

2018-03-01

We present preliminary through-pellicle imaging using a 30nm tabletop extreme ultraviolet (EUV) coherent diffractive imaging microscope. We show that even in a non-optimized setup, this technique enables through-pellicle imaging of a sample with no detectable impact on image fidelity or resolution.

NXE pellicle: offering a EUV pellicle solution to the industry

NASA Astrophysics Data System (ADS)

Brouns, Derk; Bendiksen, Aage; Broman, Par; Casimiri, Eric; Colsters, Paul; Delmastro, Peter; de Graaf, Dennis; Janssen, Paul; van de Kerkhof, Mark; Kramer, Ronald; Kruizinga, Matthias; Kuntzel, Henk; van der Meulen, Frits; Ockwell, David; Peter, Maria; Smith, Daniel; Verbrugge, Beatrijs; van de Weg, David; Wiley, Jim; Wojewoda, Noelie; Zoldesi, Carmen; van Zwol, Pieter

2016-03-01

Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. This paper shows results of how we took this concept to a complete EUV pellicle solution for the industry. We will highlight some technical design challenges we faced developing the NXE pellicle and how we solved them. We will also present imaging results of pellicle exposures on a 0.33 NA NXE scanner system. In conjunction with the NXE pellicle, we will also present the supporting tooling we have developed to enable pellicle use.

Method of fabricating reflection-mode EUV diffusers

DOEpatents

Anderson, Erik; Naulleau, Patrick P.

2005-03-01

Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.