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Sample records for extreme ultraviolet generation

  1. Generation of extreme ultraviolet vortex beams using computer generated holograms.

    PubMed

    Terhalle, Bernd; Langner, Andreas; Päivänranta, Birgit; Guzenko, Vitaliy A; David, Christian; Ekinci, Yasin

    2011-11-01

    We fabricate computer generated holograms for the generation of phase singularities at extreme ultraviolet (EUV) wavelengths using electron beam lithography and demonstrate their ability to generate optical vortices in the nonzero diffraction orders. To this end, we observe the characteristic intensity distribution of the vortex beam and verify the helical phase structure interferometrically. The presented method forms the basis for further studies on singular light fields in the EUV frequency range, i.e., in EUV interference lithography. Since the method is purely achromatic, it may also find applications in various fields of x ray optics.

  2. An extreme ultraviolet interferometer using high order harmonic generation

    NASA Astrophysics Data System (ADS)

    Laban, D. E.; Palmer, A. J.; Wallace, W. C.; Gaffney, N. S.; Notermans, R. P. M. J. W.; Clevis, T. T. J.; Pullen, M. G.; Jiang, D.; Quiney, H. M.; Litvinyuk, I. V.; Kielpinski, D.; Sang, R. T.

    2014-04-01

    We present a new interferometer technique based on the interference of high-order harmonic generation radiation from translatable successive gas jets. The phase shifts in the apparatus are shown to originate from the Gouy phase shift of the driving laser. The technique can be used to deliver time delays between light pulses and we demonstrate the unprecedented capability of delivering pulses of extreme ultraviolet light delayed in time by as small as 100 zeptoseconds.

  3. Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak

    2006-10-03

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

  4. Graphene defect formation by extreme ultraviolet generated photoelectrons

    SciTech Connect

    Gao, A. Lee, C. J.; Bijkerk, F.

    2014-08-07

    We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we have mimicked the process by using low energy primary electrons. Graphene is irradiated by an electron beam with energy lower than 80 eV. After e-beam irradiation, it is found that the D peak, I(D), appears in the Raman spectrum, indicating defect formation in graphene. The evolution of I(D)/I(G) follows the amorphization trajectory with increasing irradiation dose, indicating that graphene goes through a transformation from microcrystalline to nanocrystalline and then further to amorphous carbon. Further, irradiation of graphene with increased water partial pressure does not significantly change the Raman spectra, which suggests that, in the extremely low energy range, e-beam induced chemical reactions between residual water and graphene are not the dominant mechanism driving defect formation in graphene. Single layer graphene, partially suspended over holes was irradiated with EUV radiation. By comparing with the Raman results from e-beam irradiation, it is concluded that the photoelectrons, especially those from the valence band, contribute to defect formation in graphene during irradiation.

  5. Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

    NASA Astrophysics Data System (ADS)

    Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

    2017-06-01

    In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.

  6. Coherent Extreme Ultraviolet Generation and Surface Studies Using Ultraviolet Excimer Lasers.

    DTIC Science & Technology

    1986-02-10

    are detected by a two-stage multi-channel plate detector, (MCP-Chevron type), which is connected to a transient digitizer (Tektronix 7912 AD). The...Supplement). 43. "Ultraviolet Excitation of Cryogenic Rare-Gas Chlorine Solutions ," H. Jara, M. Shahidi, H. Pummer, H. Egger, akd C. K. Rhodes, in...like core. In principle, these equations are nonlinear in the applied electromagnetic field. We observe that the incident electromagentic field has a

  7. Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

    SciTech Connect

    Medvedev, V. V. Kruijs, R. W. E. van de; Yakshin, A. E.; Novikova, N. N.; Krivtsun, V. M.; Louis, E.; Bijkerk, F.; Yakunin, A. M.

    2013-11-25

    We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

  8. Attosecond extreme ultraviolet generation in cluster by using spatially inhomogeneous field

    SciTech Connect

    Feng, Liqiang; Liu, Hang

    2015-01-15

    A promising method to generate the attosecond extreme ultraviolet (XUV) sources has been theoretically investigated emerging from the two-dimensional Ar{sup +} cluster driven by the spatially inhomogeneous field. The results show that with the introduction of the Ar{sup +} cluster model, not only the harmonic cutoffs are enhanced, but also the harmonic yields are reinforced. Furthermore, by properly moderating the inhomogeneity as well as the laser parameters of the inhomogeneous field, the harmonic cutoff can be further extended. As a result, three almost linearly polarized XUV pulses with durations of 40 as, 42 as, and 45 as can be obtained.

  9. Spin-on-glass coatings for the generation of super-polishedsubstrates for extreme ultraviolet optics

    SciTech Connect

    Salmassi, Farhad; Naulleau, Patrick P.; Gullikson, Eric M.

    2005-01-01

    Substrates intended for use as extreme ultraviolet (EUV) optics have extremely stringent requirements in terms of finish. These requirements can dramatically increase the cost and fabrication time, especially when non-conventional shapes, such as toroids, are required. Here we present a spin-on-glass resist process capable of generating super-polished parts from inexpensive substrates. The method has been used to render diamond-turned substrates compatible for use as EUV optics. Toroidal diamond-turned optics with starting rms roughness in the 3.3 to 3.7 nm range have been smoothed to the 0.4 to 0.6 nm range. EUV reflectometry characterization of these optics has demonstrated reflectivities of approximately 63%.

  10. Extreme Ultraviolet Fractional Orbital Angular Momentum Beams from High Harmonic Generation.

    PubMed

    Turpin, Alex; Rego, Laura; Picón, Antonio; San Román, Julio; Hernández-García, Carlos

    2017-03-10

    We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regime preserve the characteristic signatures of the driving beam, namely ringlike transverse intensity profile and CR-like polarization distribution. As a result, through orbital and spin angular momentum conservation, harmonic beams are emitted with fractional orbital angular momentum, and they can be synthesized into structured attosecond helical beams -or "structured attosecond light springs"- with rotating linear polarization along the azimuth. Our proposal overcomes the state of the art limitations for the generation of light beams far from the visible domain carrying non-integer orbital angular momentum and could be applied in fields such as diffraction imaging, EUV lithography, particle trapping, and super-resolution imaging.

  11. Extreme Ultraviolet Fractional Orbital Angular Momentum Beams from High Harmonic Generation

    NASA Astrophysics Data System (ADS)

    Turpin, Alex; Rego, Laura; Picón, Antonio; San Román, Julio; Hernández-García, Carlos

    2017-03-01

    We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regime preserve the characteristic signatures of the driving beam, namely ringlike transverse intensity profile and CR-like polarization distribution. As a result, through orbital and spin angular momentum conservation, harmonic beams are emitted with fractional orbital angular momentum, and they can be synthesized into structured attosecond helical beams –or “structured attosecond light springs”– with rotating linear polarization along the azimuth. Our proposal overcomes the state of the art limitations for the generation of light beams far from the visible domain carrying non-integer orbital angular momentum and could be applied in fields such as diffraction imaging, EUV lithography, particle trapping, and super-resolution imaging.

  12. Generation of isolated attosecond extreme ultraviolet pulses employing nanoplasmonic field enhancement: optimization of coupled ellipsoids

    NASA Astrophysics Data System (ADS)

    Stebbings, S. L.; Süßmann, F.; Yang, Y.-Y.; Scrinzi, A.; Durach, M.; Rusina, A.; Stockman, M. I.; Kling, M. F.

    2011-07-01

    The production of extreme ultraviolet (XUV) radiation via nanoplasmonic field-enhanced high-harmonic generation (HHG) in gold nanostructures at MHz repetition rates is investigated theoretically in this paper. Analytical and numerical calculations are employed and compared in order to determine the plasmonic fields in gold ellipsoidal nanoparticles. The comparison indicates that numerical calculations can accurately predict the field enhancement and plasmonic decay, but may encounter difficulties when attempting to predict the oscillatory behavior of the plasmonic field. Numerical calculations for coupled symmetric and asymmetric ellipsoids for different carrier-envelope phases (CEPs) of the driving laser field are combined with time-dependent Schrödinger equation simulations to predict the resulting HHG spectra. The studies reveal that the plasmonic field oscillations, which are controlled by the CEP of the driving laser field, play a more important role than the nanostructure configuration in finding the optimal conditions for the generation of isolated attosecond XUV pulses via nanoplasmonic field enhancement.

  13. Extreme ultraviolet tomography of multi-jet gas puff target for high-order harmonic generation

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Węgrzyński, Ł.; Zápražný, Z.; Bartnik, A.; Fok, T.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Korytár, D.; Fiedorowicz, H.

    2014-10-01

    A volume, tomographic reconstruction of a novel, multi-jet gas puff target, developed for possible applications in high-order harmonic generation (HHG), is presented. The target, produced by pulsed injection of argon gas through nozzle in a form of linearly oriented small orifices, has been characterized in the extreme ultraviolet at 13.5 nm wavelength. Target density estimations were performed, and 3-D representation of pulsed gaseous target has been obtained by combining 2-D shadowgram images, recorded at various rotation angles. More detailed information about higher-order jets, formed as a result of collisions of primary jets, was obtained. Tomographic studies of such type of targets dedicated for HHG have been obtained to our knowledge for the first time.

  14. Nonperturbative Twist in the Generation of Extreme-Ultraviolet Vortex Beams.

    PubMed

    Rego, Laura; Román, Julio San; Picón, Antonio; Plaja, Luis; Hernández-García, Carlos

    2016-10-14

    High-order harmonic generation (HHG) has been recently proven to produce extreme-ultraviolet (XUV) vortices from the nonlinear conversion of infrared twisted beams. Previous works have demonstrated a linear scaling law of the vortex charge with the harmonic order. We demonstrate that this simple law hides an unexpectedly rich scenario for the buildup of orbital angular momentum (OAM) due to the nonperturbative behavior of HHG. The complexity of these twisted XUV beams appears only when HHG is driven by nonpure vortex modes, where the XUV OAM content is dramatically increased. We explore the underlying mechanisms for this diversity and derive a general conservation rule for the nonperturbative OAM buildup. The simple scaling found in previous works corresponds to the collapse of this scenario for the particular case of pure (single-mode) OAM driving fields.

  15. Nonperturbative Twist in the Generation of Extreme-Ultraviolet Vortex Beams

    NASA Astrophysics Data System (ADS)

    Rego, Laura; Román, Julio San; Picón, Antonio; Plaja, Luis; Hernández-García, Carlos

    2016-10-01

    High-order harmonic generation (HHG) has been recently proven to produce extreme-ultraviolet (XUV) vortices from the nonlinear conversion of infrared twisted beams. Previous works have demonstrated a linear scaling law of the vortex charge with the harmonic order. We demonstrate that this simple law hides an unexpectedly rich scenario for the buildup of orbital angular momentum (OAM) due to the nonperturbative behavior of HHG. The complexity of these twisted XUV beams appears only when HHG is driven by nonpure vortex modes, where the XUV OAM content is dramatically increased. We explore the underlying mechanisms for this diversity and derive a general conservation rule for the nonperturbative OAM buildup. The simple scaling found in previous works corresponds to the collapse of this scenario for the particular case of pure (single-mode) OAM driving fields.

  16. Extreme-ultraviolet frequency combs from high-order harmonic generation with few-cycle pulse trains

    NASA Astrophysics Data System (ADS)

    Tudorovskaya, Maria; Lein, Manfred

    2017-04-01

    The spectrum of a high-repetition train of laser pulses consists of many equally spaced lines, forming an optical frequency comb which is useful for high-precision spectroscopy. By exposing atoms to a train of strong pulses, frequency combs reaching into the extreme ultraviolet may be produced via high-order harmonic generation. Here, we report a theoretical study of extreme-ultraviolet frequency-comb generation by trains of few-cycle pulses. We analyze the nontrivial comb structure arising from overlapping harmonic orders. The spacings of the comb lines and their dependence on the offset frequency of the incident pulse train are discussed.

  17. Characterization of material ablation driven by laser generated intense extreme ultraviolet light

    SciTech Connect

    Tanaka, Nozomi Masuda, Masaya; Deguchi, Ryo; Murakami, Masakatsu; Fujioka, Shinsuke; Yogo, Akifumi; Nishimura, Hiroaki; Sunahara, Atsushi

    2015-09-14

    We present a comparative study on the hydrodynamic behaviour of plasmas generated by material ablation by the irradiation of nanosecond extreme ultraviolet (EUV or XUV) or infrared laser pulses on solid samples. It was clarified that the difference in the photon energy deposition and following material heating mechanism between these two lights result in the difference in the plasma parameters and plasma expansion characteristics. Silicon plate was ablated by either focused intense EUV pulse (λ = 9–25 nm, 10 ns) or laser pulse (λ = 1064 nm, 10 ns), both with an intensity of ∼10{sup 9 }W/cm{sup 2}. Both the angular distributions and energy spectra of the expanding ions revealed that the photoionized plasma generated by the EUV light differs significantly from that produced by the laser. The laser-generated plasma undergoes spherical expansion, whereas the EUV-generated plasma undergoes planar expansion in a comparatively narrow angular range. It is presumed that the EUV radiation is transmitted through the expanding plasma and directly photoionizes the samples in the solid phase, consequently forming a high-density and high-pressure plasma. Due to a steep pressure gradient along the direction of the target normal, the EUV plasma expands straightforward resulting in the narrower angular distribution observed.

  18. Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source

    NASA Astrophysics Data System (ADS)

    Vinokhodov, A.; Krivokorytov, M.; Sidelnikov, Yu.; Krivtsun, V.; Medvedev, V.; Bushuev, V.; Koshelev, K.; Glushkov, D.; Ellwi, S.

    2016-10-01

    We present the results of the low-melting liquid metal droplets generation based on excited Rayleigh jet breakup. We discuss on the operation of the industrial and in-house designed and manufactured dispensing devices for the droplets generation. Droplet diameter can be varied in the range of 30-90 μm. The working frequency of the droplets, velocity, and the operating temperature were in the ranges of 20-150 kHz, 4-15 m/s, and up to 250 °C, respectively. The standard deviations for the droplet center of mass position both their diameter σ < 1 μm at the distance of 45 mm from the nozzle. Stable operation in the long-term (over 1.5 h) was demonstrated for a wide range of the droplet parameters: diameters, frequencies, and velocities. Physical factors affecting the stability of the generator operation have been identified. The technique for droplet synchronization, allowing using the droplet as a target for laser produced plasma, has been created; in particular, the generator has been successfully used in a high brightness extreme ultraviolet (EUV) light source. The operation with frequency up to 8 kHz was demonstrated as a result of the experimental simulation, which can provide an average brightness of the EUV source up to ˜1.2 kW/mm2 sr.

  19. Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser

    SciTech Connect

    Nagano, Akihisa; Inoue, Takahiro; Nica, Petru-Edward; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

    2007-04-09

    An extreme ultraviolet source having a tamper has been studied. This target scheme recombines forcedly lithium ions by low temperature electrons from the tamper, converting Li{sup 3+} rapidly to excited Li{sup 2+} which emit intense 1s-2p Lyman {alpha} emissions at 13.5 nm. A strong 13.5 nm emission appeared at 20-30 ns after the time of laser peak within a small space volume near the tamper. The authors obtained an enhancement of extreme ultraviolet conversion efficiency by a factor of about 2 with the tamper against that of a target without the tamper at the same laser irradiation condition00.

  20. Extreme ultraviolet lithography machine

    DOEpatents

    Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

    2000-01-01

    An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

  1. Extreme Ultraviolet Fractional Orbital Angular Momentum Beams from High Harmonic Generation

    PubMed Central

    Turpin, Alex; Rego, Laura; Picón, Antonio; San Román, Julio; Hernández-García, Carlos

    2017-01-01

    We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regime preserve the characteristic signatures of the driving beam, namely ringlike transverse intensity profile and CR-like polarization distribution. As a result, through orbital and spin angular momentum conservation, harmonic beams are emitted with fractional orbital angular momentum, and they can be synthesized into structured attosecond helical beams –or “structured attosecond light springs”– with rotating linear polarization along the azimuth. Our proposal overcomes the state of the art limitations for the generation of light beams far from the visible domain carrying non-integer orbital angular momentum and could be applied in fields such as diffraction imaging, EUV lithography, particle trapping, and super-resolution imaging. PMID:28281655

  2. Extreme-ultraviolet polarimeter utilizing laser-generated high-order harmonics.

    PubMed

    Brimhall, Nicole; Turner, Matthew; Herrick, Nicholas; Allred, David D; Turley, R Steven; Ware, Michael; Peatross, Justin

    2008-10-01

    We describe an extreme-ultraviolet (EUV) polarimeter that employs laser-generated high-order harmonics as the light source. The polarimeter is designed to characterize materials and thin films for use with EUV light. Laser high harmonics are highly directional with easily rotatable linear polarization, not typically available with other EUV sources. The harmonics have good wavelength coverage, potentially spanning the entire EUV from a few to a hundred nanometers. Our instrument is configured to measure reflectances from 14 to 30 nm and has approximately 180 spectral resolution (lambda/Delta lambda). The reflection from a sample surface can be measured over a continuous range of incident angles (5 degrees-75 degrees). A secondary 14 cm gas cell attenuates the harmonics in a controlled way to keep signals within the linear dynamic range of the detector, comprised of a microchannel plate coupled to a phosphorous screen and charge coupled device camera. The harmonics are produced using approximately 10 mJ, approximately 35 fs, and approximately 800 nm laser pulses with a repetition rate of 10 Hz. Per-shot energy monitoring of the laser discriminates against fluctuations. The polarimeter reflectance data agree well with data obtained at the Advanced Light Source Synchrotron (Beamline 6.3.2).

  3. Spatial characterization of extreme ultraviolet plasmas generated by laser excitation of xenon gas targets

    NASA Astrophysics Data System (ADS)

    Kranzusch, Sebastian; Peth, Christian; Mann, Klaus

    2003-02-01

    At Laser-Laboratorium Göttingen laser-plasma sources were tested, which are going to be used for characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. In all cases extreme ultraviolet (EUV) radiation is generated by focusing a Q-switched Nd:YAG laser into a pulsed gas puff target. By the use of xenon or oxygen as target gas, broadband as well as narrowband EUV radiation is obtained, respectively. Different types of valves and nozzles were tested in order to optimize the emitted radiation with respect to maximum EUV intensities, small source diameters, and positional stability. The investigation of these crucial source parameters was performed with specially designed EUV pinhole cameras, utilizing evaluation algorithms developed for standardized laser beam characterization. In addition, a rotatable pinhole camera was developed which allows both spatially and angular resolved monitoring of the soft x-ray emission characteristics. With the help of this camera a strong angular dependence of the EUV intensity was found. The data were compared with fluorescence measurements for visualization of the target gas jet. The experimental observations can be explained by reabsorption of the generated EUV radiation in the surrounding target gas, as supported by semiempirical model calculations based on the attenuation in the three-dimensional gas density according to Lambert-Beer's law. As a consequence of the presented investigations, an optimization of the EUV source with respect to intensity, plasma shape, and angular dependence is achieved, resulting in a spherical plasma of 200 μm diameter and a 50% increase of the EUV pulse energy.

  4. Generation of bright phase-matched circularly-polarized extreme ultraviolet high harmonics

    NASA Astrophysics Data System (ADS)

    Kfir, Ofer; Grychtol, Patrik; Turgut, Emrah; Knut, Ronny; Zusin, Dmitriy; Popmintchev, Dimitar; Popmintchev, Tenio; Nembach, Hans; Shaw, Justin M.; Fleischer, Avner; Kapteyn, Henry; Murnane, Margaret; Cohen, Oren

    2015-02-01

    Circularly-polarized extreme ultraviolet and X-ray radiation is useful for analysing the structural, electronic and magnetic properties of materials. To date, such radiation has only been available at large-scale X-ray facilities such as synchrotrons. Here, we demonstrate the first bright, phase-matched, extreme ultraviolet circularly-polarized high harmonics source. The harmonics are emitted when bi-chromatic counter-rotating circularly-polarized laser pulses field-ionize a gas in a hollow-core waveguide. We use this new light source for magnetic circular dichroism measurements at the M-shell absorption edges of Co. We show that phase-matching of circularly-polarized harmonics is unique and robust, producing a photon flux comparable to linearly polarized high harmonic sources. This work represents a critical advance towards the development of table-top systems for element-specific imaging and spectroscopy of multiple elements simultaneously in magnetic and other chiral media with very high spatial and temporal resolution.

  5. Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography

    NASA Astrophysics Data System (ADS)

    Cummins, Thomas

    The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviolet (EUV) photoemission around 13.5 nm, from laser produced tin (Sn) plasmas. EUV lithography has been identified as the leading next generation technology to take over from the current optical lithography systems, due to its potential of printing smaller feature sizes on integrated circuits. Many of the problems hindering the implementation of EUV lithography for high volume manufacturing have been overcome during the past 20 years of development. However, the lack of source power is a major concern for realising EUV lithography and remains a major roadblock that must be overcome. Therefore in order to optimise and improve the EUV emission from Sn laser plasma sources, many parameters contributing to the make-up of an EUV source are investigated. Chapter 3 presents the results of varying several different experimental parameters on the EUV emission from Sn laser plasmas. Several of the laser parameters including the energy, gas mixture, focusing lens position and angle of incidence are changed, while their effect on the EUV emission is studied. Double laser pulse experiments are also carried out by creating plasma targets for the main laser pulse to interact with. The resulting emission is compared to that of a single laser pulse on solid Sn. Chapter 4 investigates tailoring the CO2 laser pulse duration to improve the efficiency of an EUV source set-up. In doing so a new technique for shortening the time duration of the pulse is described. The direct effects of shortening the CO2 laser pulse duration on the EUV emission from Sn are then studied and shown to improve the efficiency of the source. In Chapter 5 a new plasma target type is studied and compared to the previous dual laser experiments. Laser produced colliding plasma jet targets form a new plasma layer, with densities that can be optimised for re-heating with the main CO2 laser pulse. Chapter 6 will present

  6. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation

    NASA Astrophysics Data System (ADS)

    Plötzing, M.; Adam, R.; Weier, C.; Plucinski, L.; Eich, S.; Emmerich, S.; Rollinger, M.; Aeschlimann, M.; Mathias, S.; Schneider, C. M.

    2016-04-01

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  7. Spin-resolved photoelectron spectroscopy using femtosecond extreme ultraviolet light pulses from high-order harmonic generation

    SciTech Connect

    Plötzing, M.; Adam, R. Weier, C.; Plucinski, L.; Schneider, C. M.; Eich, S.; Emmerich, S.; Rollinger, M.; Aeschlimann, M.; Mathias, S.

    2016-04-15

    The fundamental mechanism responsible for optically induced magnetization dynamics in ferromagnetic thin films has been under intense debate since almost two decades. Currently, numerous competing theoretical models are in strong need for a decisive experimental confirmation such as monitoring the triggered changes in the spin-dependent band structure on ultrashort time scales. Our approach explores the possibility of observing femtosecond band structure dynamics by giving access to extended parts of the Brillouin zone in a simultaneously time-, energy- and spin-resolved photoemission experiment. For this purpose, our setup uses a state-of-the-art, highly efficient spin detector and ultrashort, extreme ultraviolet light pulses created by laser-based high-order harmonic generation. In this paper, we present the setup and first spin-resolved spectra obtained with our experiment within an acquisition time short enough to allow pump-probe studies. Further, we characterize the influence of the excitation with femtosecond extreme ultraviolet pulses by comparing the results with data acquired using a continuous wave light source with similar photon energy. In addition, changes in the spectra induced by vacuum space-charge effects due to both the extreme ultraviolet probe- and near-infrared pump-pulses are studied by analyzing the resulting spectral distortions. The combination of energy resolution and electron count rate achieved in our setup confirms its suitability for spin-resolved studies of the band structure on ultrashort time scales.

  8. Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources

    SciTech Connect

    Cummins, T.; O'Gorman, C.; Dunne, P.; Sokell, E.; O'Sullivan, G.; Hayden, P.

    2014-07-28

    Colliding plasmas produced by neodymium-doped yttrium aluminium garnet (Nd:YAG) laser illumination of tin wedge targets form stagnation layers, the physical parameters of which can be controlled to optimise coupling with a carbon dioxide (CO{sub 2}) heating laser pulse and subsequent extreme ultraviolet (EUV) production. The conversion efficiency (CE) of total laser energy into EUV emission at 13.5 nm ± 1% was 3.6%. Neglecting both the energy required to form the stagnation layer and the EUV light produced before the CO{sub 2} laser pulse is incident results in a CE of 5.1% of the CO{sub 2} laser energy into EUV light.

  9. Generating circularly polarized radiation in the extreme ultraviolet spectral range at the free-electron laser FLASH

    NASA Astrophysics Data System (ADS)

    von Korff Schmising, Clemens; Weder, David; Noll, Tino; Pfau, Bastian; Hennecke, Martin; Strüber, Christian; Radu, Ilie; Schneider, Michael; Staeck, Steffen; Günther, Christian M.; Lüning, Jan; Merhe, Alaa el dine; Buck, Jens; Hartmann, Gregor; Viefhaus, Jens; Treusch, Rolf; Eisebitt, Stefan

    2017-05-01

    A new device for polarization control at the free electron laser facility FLASH1 at DESY has been commissioned for user operation. The polarizer is based on phase retardation upon reflection off metallic mirrors. Its performance is characterized in three independent measurements and confirms the theoretical predictions of efficient and broadband generation of circularly polarized radiation in the extreme ultraviolet spectral range from 35 eV to 90 eV. The degree of circular polarization reaches up to 90% while maintaining high total transmission values exceeding 30%. The simple design of the device allows straightforward alignment for user operation and rapid switching between left and right circularly polarized radiation.

  10. Extreme ultraviolet Talbot interference lithography.

    PubMed

    Li, Wei; Marconi, Mario C

    2015-10-05

    Periodic nanopatterns can be generated using lithography based on the Talbot effect or optical interference. However, these techniques have restrictions that limit their performance. High resolution Talbot lithography is limited by the very small depth of focus and the demanding requirements in the fabrication of the master mask. Interference lithography, with large DOF and high resolution, is limited to simple periodic patterns. This paper describes a hybrid extreme ultraviolet lithography approach that combines Talbot lithography and interference lithography to render an interference pattern with a lattice determined by a Talbot image. As a result, the method enables filling the arbitrary shaped cells produced by the Talbot image with interference patterns. Detailed modeling, system design and experimental results using a tabletop EUV laser are presented.

  11. Excluded volume effects caused by high concentration addition of acid generators in chemically amplified resists used for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Watanabe, Kyoko; Matsuoka, Kyoko; Yamamoto, Hiroki; Komuro, Yoshitaka; Kawana, Daisuke; Yamazaki, Akiyoshi

    2017-08-01

    The resolution of lithography used for the high-volume production of semiconductor devices has been improved to meet the market demands for highly integrated circuits. With the reduction in feature size, the molecular size becomes non-negligible in the resist material design. In this study, the excluded volume effects caused by adding high-concentration acid generators were investigated for triphenylsulfonium nonaflate. The resist film density was measured by X-ray diffractometry. The dependences of absorption coefficient and protected unit concentration on acid generator weight ratio were calculated from the measured film density. Using these values, the effects on the decomposition yield of acid generators, the protected unit fluctuation, and the line edge roughness (LER) were evaluated by simulation on the basis of sensitization and reaction mechanisms of chemically amplified extreme ultraviolet resists. The positive effects of the increase in acid generator weight ratio on LER were predominant below the acid generator weight ratio of 0.3, while the negative effects became equivalent to the positive effects above the acid generator weight ratio of 0.3 owing to the excluded volume effects.

  12. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    2000-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  13. Method for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, Glenn D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

  14. HELIOS—A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy

    SciTech Connect

    Plogmaker, S. E-mail: Joachim.Terschluesen@physics.uu.se Terschlüsen, J. A. E-mail: Joachim.Terschluesen@physics.uu.se Krebs, N.; Svanqvist, M.; Forsberg, J.; Cappel, U. B.; Rubensson, J.-E.; Siegbahn, H.; Söderström, J. E-mail: Joachim.Terschluesen@physics.uu.se

    2015-12-15

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20 000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10{sup 10} photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  15. Quasi-supercontinuum source in the extreme ultraviolet using multiple frequency combs from high-harmonic generation

    DOE PAGES

    Wünsche, Martin; Fuchs, Silvio; Aull, Stefan; ...

    2017-03-16

    A quasi-supercontinuum source in the extreme ultraviolet (XUV) is demonstrated using a table-top femtosecond laser and a tunable optical parametric amplifier (OPA) as a driver for high-harmonic generation (HHG). The harmonic radiation, which is usually a comb of odd multiples of the fundamental frequency, is generated by near-infrared (NIR) laser pulses from the OPA. A quasi-continuous XUV spectrum in the range of 30 to 100 eV is realized by averaging over multiple harmonic comb spectra with slightly different fundamental frequencies and thus different spectral spacing between the individual harmonics. The driving laser wavelength is swept automatically during an averaging timemore » period. With a total photon flux of 4×109 photons/s in the range of 30 eV to 100 eV and 1×107 photons/s in the range of 100 eV to 200 eV, the resulting quasi-supercontinuum XUV source is suited for applications such as XUV coherence tomography (XCT) or near-edge absorption fine structure spectroscopy (NEXAFS).« less

  16. HELIOS--A laboratory based on high-order harmonic generation of extreme ultraviolet photons for time-resolved spectroscopy.

    PubMed

    Plogmaker, S; Terschlüsen, J A; Krebs, N; Svanqvist, M; Forsberg, J; Cappel, U B; Rubensson, J-E; Siegbahn, H; Söderström, J

    2015-12-01

    In this paper, we present the HELIOS (High Energy Laser Induced Overtone Source) laboratory, an in-house high-order harmonic generation facility which generates extreme ultraviolet (XUV) photon pulses in the range of 15-70 eV with monochromatized XUV pulse lengths below 35 fs. HELIOS is a source for time-resolved pump-probe/two-color spectroscopy in the sub-50 fs range, which can be operated at 5 kHz or 10 kHz. An optical parametric amplifier is available for pump-probe experiments with wavelengths ranging from 240 nm to 20,000 nm. The produced XUV radiation is monochromatized by a grating in the so-called off-plane mount. Together with overall design parameters, first monochromatized spectra are shown with an intensity of 2 ⋅ 10(10) photons/s (at 5 kHz) in the 29th harmonic, after the monochromator. The XUV pulse duration is measured to be <25 fs after monochromatization.

  17. Generation of Bright Phase-matched Circularly-polarized Extreme Ultraviolet High Harmonics

    DTIC Science & Technology

    2014-12-08

    molecular decay dynamics2, the direct measurement of quantum phases (for example, Berry’s phase and pseudo- spin ) in graphene and topological insulators3,4 and...Lett. 12, 3900–3904 (2012). 4. Xu, S.-Y. et al. Hedgehog spin texture and Berry’s phase tuning in a magnetic topological insulator. Nature Phys. 8, 616...Mauger, F., Bandrauk, A. D., Kamor, A., Uzer, T. & Chandre, C. Quantum - classical correspondence in circularly polarized high harmonic generation. J. Phys

  18. Influence of the electrode wear on the EUV generation of a discharge based extreme ultraviolet light source

    NASA Astrophysics Data System (ADS)

    Vieker, Jochen; Bergmann, Klaus

    2017-08-01

    Reliability and a long maintenance interval are major requirements for the industrial use of an extreme ultraviolet (EUV) source. In this paper we present results on the influence of the electrode erosion on the EUV generation and its lifetime limiting characteristics. The geometry of the electrodes and their influence on the gas pressure distribution within the electrode system have been found to be the key variables to characterize the regime of operation. This better understanding allows for an optimization of device parameters (e.g. gas flow or pulse energy) to counteract the erosion process, in order to increase the maintenance interval and EUV output. The EUV source under investigation is based on a hollow cathode triggered pinch plasma. A new trigger concept is introduced that enables free adjustment of the gas pressure during operation, thus enabling the operation with a high conversion efficiency of up to  >0.7 %/2πsr at 13.5 nm and 2% bandwidth. The efficiency for the peak brilliance is up to ~2.6 W kW-1 mm-2sr-1 while the maximum electrical input power of the system is 15 kW.

  19. Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

    NASA Astrophysics Data System (ADS)

    Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

    2016-03-01

    Novel projection electron microscope optics have been developed and integrated into a new inspection system named EBEYE-V30 ("Model EBEYE" is an EBARA's model code) , and the resulting system shows promise for application to half-pitch (hp) 16-nm node extreme ultraviolet lithography (EUVL) patterned mask inspection. To improve the system's inspection throughput for 11-nm hp generation defect detection, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and an image capture area deflector that operates simultaneously with the mask scanning motion have been developed. A learning system has been used for the mask inspection tool to meet the requirements of hp 11-nm node EUV patterned mask inspection. Defects are identified by the projection electron microscope system using the "defectivity" from the characteristics of the acquired image. The learning system has been developed to reduce the labor and costs associated with adjustment of the detection capability to cope with newly-defined mask defects. We describe the integration of the developed elements into the inspection tool and the verification of the designed specification. We have also verified the effectiveness of the learning system, which shows enhanced detection capability for the hp 11-nm node.

  20. High-peak-power surface high-harmonic generation at extreme ultra-violet wavelengths from a tape

    SciTech Connect

    Shaw, B. H.; Tilborg, J. van; Sokollik, T.; Schroeder, C. B.; McKinney, W. R.; Artemiev, N. A.; Yashchuk, V. V.; Gullikson, E. M.; Leemans, W. P.

    2013-07-28

    Solid-based surface high-harmonic generation from a tape is experimentally studied. By operating at mildly relativistic normalized laser strengths a{sub 0}≲0.2, harmonics up to the 17th order are efficiently produced in the coherent wake emission (CWE) regime. CWE pulse properties, such as divergence, energy, conversion efficiency, and spectrum, are investigated for various tape materials and drive laser conditions. A clear correlation between surface roughness and harmonic beam divergence is found. At the measured pulse properties for the 15th harmonic (conversion efficiency ∼6.5×10{sup −7}, divergence ∼7−15 mrad), the 100-mJ-level drive laser produces several MWs of extreme ultra-violet pulses. The spooling tape configuration enables multi-Hz operation over thousands of shots, making this source attractive as a seed to the few-Hz laser-plasma-accelerator-driven free-electron laser (FEL). Models indicate that these CWE pulses with MW level powers are sufficient for seed-induced bunching and FEL gain.

  1. Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

    NASA Astrophysics Data System (ADS)

    Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Pret, Alessandro Vaglio; Gronheid, Roel

    2013-04-01

    One of the main challenges for developing extreme ultraviolet resists is to satisfy critical dimension uniformity (CDU) and sidewall roughness of contacts to the allowable limit. To this end, further understanding of the effects of resist ingredients on CDU and contact edge roughness (CER) is required. We investigate the effects of a photoacid generator (PAG), sensitizer and quencher concentrations on the CDU and CER. We find that the dependencies of CDU on sensitizer and quencher are dominated by photon shot noise (PSN) effects whereas a more complicated interplay between PSN and PAG distribution statistics should be considered in the dependence of CDU on PAG concentration. The estimated CER parameters [root mean square (RMS) value and correlation length ξ] exhibit a merging trend when plotted against the final critical dimension (CD). In addition, RMS value increases with exposure dose and PAG loading contrary to shot noise expectations. Power spectrum analysis reveals the dominant contribution of low-frequency undulations to CER, which is attributed to the enhanced interaction along specific directions between the aerial image and/or acid kinetics of nearby contacts. This inter-contact effect is further intensified with CD for fixed pitch and may explain the observed CER behavior.

  2. Extreme ultraviolet spectroscopy of Capella

    NASA Technical Reports Server (NTRS)

    Green, James C.; Wilkinson, Erik; Ayres, Thomas R.; Cash, Webster C.

    1992-01-01

    The X-ray active binary system Capella was observed with a moderate-resolution extreme ultraviolet spectrograph from 200 to 330 A. Two low-level emission features were detected. One most likely is geocoronal He II 304 A emission, while the other probably originates from the corona of Capella. The weak stellar emission at 304 A is in direct conflict with predictions of the intrinsic stellar He II flux based on standard scaling arguments but is consistent with the only previous observation of Capella in the EUV. The most plausible explanation for the lack of stellar 304 A emission is a warm wind from the active G0 III star.

  3. Extreme ultraviolet photoionization of aldoses and ketoses

    NASA Astrophysics Data System (ADS)

    Shin, Joong-Won; Dong, Feng; Grisham, Michael E.; Rocca, Jorge J.; Bernstein, Elliot R.

    2011-04-01

    Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical fragment ions regardless of size, and ketoses, while also generating same ions as aldoses, yields additional features. Extensive fragmentation of the monosaccharides is the result the EUV photons ionizing various inner valence orbitals. The observed fragmentation patterns are not dependent upon hydrogen bonding structure or OH group orientation.

  4. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Labov, S. E.

    1985-01-01

    Instruments designed to explore different aspects of far and extreme ultraviolet cosmic radiation were studied. The far ultraviolet imager (FUVI) was flown on the Aries sounding rocket. Its unique large format 75mm detector mapped out the far ultraviolet background radiation with a resolution of only a few arc minutes. Analysis of this data indicates to what extent the FUVI background is extra galactic in origin. A power spectrum of the spatial fluctuations will have direct consequences for galactic evolution.

  5. Efficient extreme ultraviolet plasma source generated by a CO{sub 2} laser and a liquid xenon microjet target

    SciTech Connect

    Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George; Higashiguchi, Takeshi; Kubodera, Shoichi; Pogorelsky, Igor; Pavlishin, Igor; Stolyarov, Daniil; Babzien, Marcus; Kusche, Karl; Yakimenko, Vitaly

    2007-05-07

    We demonstrated efficacy of a CO{sub 2}-laser-produced xenon plasma in the extreme ultraviolet (EUV) spectral region at 13.5 nm at variable laser pulse widths between 200 ps and 25 ns. The plasma target was a 30 {mu}m liquid xenon microjet. To ensure the optimum coupling of CO{sub 2} laser energy with the plasma, they applied a prepulse yttrium aluminum garnet laser. The authors measured the conversion efficiency (CE) of the 13.5 nm EUV emission for different pulse widths of the CO{sub 2} laser. A maximum CE of 0.6% was obtained for a CO{sub 2} laser pulse width of 25 ns at an intensity of 5x10{sup 10} W/cm{sup 2}.

  6. The Diffuse Extreme Ultraviolet Background

    NASA Technical Reports Server (NTRS)

    Vallerga, John; Slavin, Jonathan

    1996-01-01

    Observations of the diffuse EUV background towards 138 different directions using the spectrometers aboard the Extreme Ultraviolet Explorer satellite (EUVE) have been combined into a spectrum from 150A to 730A and represent an effective exposure of 18 million seconds. There is no significant evidence of any non-local line flux in the resultant spectrum such as that from a hot coronal plasma. These results are inconsistent with the Wisconsin C and B broad-band surveys assuming the source is a logT = 5.8 - 6.1 hot plasma in ionization equilibrium with solar abundances, confirming the previous result of Jelinksy, Vallerga and Edelstein) (hereafter Paper 1) using an observation along the ecliptic with the same instrument. To make these results consistent with the previous broad-band surveys, the plasma responsible for the emission must either be depleted in Fe by a factor of approximately 6, be behind an absorbing slab of neutral H with a column of 2 x 10(exp 19)/sq cm, or not be in collisional ionization equilibrium (CIE). One such non-CIE model (Breitswerdt and Schmutzier) that explains the soft x-ray results is also inconsistent with this EUV data.

  7. Investigation of the ionization balance of bismuth-to-tin plasmas for the extreme ultraviolet light source based on a computer-generated collisional radiative model

    NASA Astrophysics Data System (ADS)

    Sasaki, Akira; Sunahara, Atsushi; Nishihara, Katsunobu; Nishikawa, Takeshi

    2016-10-01

    The ionization balance of the bismuth-to-tin plasmas is systematically investigated on the basis of a collisional radiative model, which has been generated using a computer algorithm to analyze the level structure of multiple charged ions to construct the model. The atomic energy levels and rate coefficients corresponding to the model are calculated using the HULLAC code. With this method, we investigate the plasma temperature, which is required to obtain emission in the extreme ultraviolet wavelength range from 13.5 nm to the water window.

  8. Astronomy and the Extreme Ultraviolet Explorer satellite.

    PubMed

    Bowyer, S

    1994-01-07

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  9. Astronomy and the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Bowyer, S.

    1994-01-01

    The extreme ultraviolet wave band (100 to 912 angstroms) was thought until recently to be useless to astronomy, primarily because the opacity of the interstellar medium would prevent observations at these wavelengths. However, the interstellar medium has been found to be markedly inhomogeneous in both density and ionization state and the sun is fortunately located in a region of low extreme ultraviolet opacity. The Extreme Ultraviolet Explorer, launched in June 1992, has surveyed the sky in this wave band and has detected a wide variety of astronomical sources at considerable distances, including some extragalactic objects. Studies in the extreme ultraviolet band have already begun to increase our understanding of the contents of the universe.

  10. Extreme Ultraviolet Explorer Bright Source List

    NASA Technical Reports Server (NTRS)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  11. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1985-01-01

    The Far Ultraviolet imager (FUVI) was flown on the Aries class sounding rocket 24.015, producing outstanding results. The diffuse extreme ultraviolet (EUV) background spectrometer which is under construction is described. It will be launched on the Black Brant sounding rocket flight number 27.086. Ongoing design studies of a high resolution spectrometer are discussed. This instrument incorporates a one meter normal incidence mirror and will be suitable for an advanced Spartan mission.

  12. Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-11-01

    The deprotonation of polymer radical cations plays an important role in the acid generation in chemically amplified resists upon exposure to ionizing radiation. In this study, the effects of the deprotonation efficiency of protected units of a resist polymer on line edge roughness (LER) and stochastic defect generation were investigated. The suppression of stochastic effects is essential for the realization of high-volume production of semiconductor devices with an 11 nm critical dimension using extreme ultraviolet (EUV) lithography. By increasing the deprotonation efficiency, the chemical contrast (latent image quality) was improved; however, the protected unit number fluctuation did not significantly change. Consequently, LER and the probability of stochastic defect generation were reduced. This effect was prominent when the protection ratio was close to 100%.

  13. Photoresists in extreme ultraviolet lithography (EUVL)

    NASA Astrophysics Data System (ADS)

    De Simone, Danilo; Vesters, Yannick; Vandenberghe, Geert

    2017-06-01

    The evolutionary advances in photosensitive material technology, together with the shortening of the exposure wavelength in the photolithography process, have enabled and driven the transistor scaling dictated by Moore's law for the last 50 years. Today, the shortening wavelength trend continues to improve the chips' performance over time by feature size miniaturization. The next-generation lithography technology for high-volume manufacturing (HVM) is extreme ultraviolet lithography (EUVL), using a light source with a wavelength of 13.5 nm. Here, we provide a brief introduction to EUVL and patterning requirements for sub-0-nm feature sizes from a photomaterial standpoint, discussing traditional and novel photoresists. Emphasis will be put on the novel class of metal-containing resists (MCRs) as well as their challenges from a manufacturing prospective.

  14. Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro

    2015-01-01

    Control of the acid catalytic chain reaction is essential in the pattern formation of chemically amplified resists used for the high-volume production of semiconductor devices. In this study, the relationships between the quencher diffusion constant and the exposure dose dependences of the line width, line edge roughness (LER), and stochastic defect generation were investigated assuming extreme ultraviolet (EUV) lithography. The dependence of the latent images of line-and-space patterns with 16 nm half-pitch on the quencher diffusion constant was calculated on the basis of sensitization and reaction mechanisms of chemically amplified EUV resists. The exposure latitude of the line width increased with the quencher diffusion constant. The dependences of LER and stochastic defect (bridges and pinching) generation on the deviation of the exposure dose became weak by increasing the quencher diffusion constant, similarly to the case for the dependence of the line width.

  15. Far-infrared-light shadowgraphy for high extraction efficiency of extreme ultraviolet light from a CO2-laser-generated tin plasma

    NASA Astrophysics Data System (ADS)

    Matsukuma, Hiraku; Hosoda, Tatsuya; Suzuki, Yosuke; Yogo, Akifumi; Yanagida, Tatsuya; Kodama, Takeshi; Nishimura, Hiroaki

    2016-08-01

    The two-color, double-pulse method is an efficient scheme to generate extreme ultraviolet light for fabricating the next generation semiconductor microchips. In this method, a Nd:YAG laser pulse is used to expand a several-tens-of-micrometers-scale tin droplet, and a CO2 laser pulse is subsequently directed at the expanded tin vapor after an appropriate delay time. We propose the use of shadowgraphy with a CO2 laser probe-pulse scheme to optimize the CO2 main-drive laser. The distribution of absorption coefficients is derived from the experiment, and the results are converted to a practical absorption rate for the CO2 main-drive laser.

  16. Extreme Ultraviolet Frequency Combs for Spectroscopy

    NASA Astrophysics Data System (ADS)

    Ozawa, A.; Herrmann, M.; Vernaleken, A.; Gohle, Ch.; Bernhardt, B.; Wilken, T.; Schneider, W.; Welter, Ph. Vilar; Knünz, S.; Batteiger, V.; Holzwarth, R.; Peters, E.; Reinhardt, S.; Hänsch, T. W.; Udem, Th.

    2009-04-01

    Optical spectroscopy has matured to the most precise measurement tool in physics thanks to advances in single ion trapping and the possibility to directly measure the frequency of laser light. However, almost 50 years after the invention of the laser the spectral region that can be investigated in this way is still restricted to wavelengths below the near ultraviolet. The much larger spectral band of the extreme ultraviolet (XUV), where many fundamental transitions of say hydrogen like ions reside, is thus far unexplored by high precision laser spectroscopy. One possible route to narrow band radiation in this region could be the use of high order harmonics generated with short laser pulses of high repetition rate focused in a gas jet. Meanwhile μW power levels in the XUV at multi-MHz repetition rates have been demonstrated which are the main prerequisites for this method. The 1S-2S two photon transition at 60 nm in singly ionized helium is a rewarding candidate because it allows sensitive tests of quantum electrodynamics.

  17. Photoresist composition for extreme ultraviolet lithography

    SciTech Connect

    Felter, T.E.; Kubiak, G.D.

    1999-11-23

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4--0.05 {mu}m using projection lithography and extreme ultraviolet (EUV) radiation is disclosed. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  18. Photoresist composition for extreme ultraviolet lithography

    DOEpatents

    Felter, T. E.; Kubiak, G. D.

    1999-01-01

    A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

  19. Far and extreme ultraviolet astronomy with ORFEUS

    NASA Technical Reports Server (NTRS)

    Kraemer, G.; Barnstedt, J.; Eberhard, N.; Grewing, M.; Gringel, W.; Haas, C.; Kaelble, A.; Kappelmann, N.; Petrik, J.; Appenzeller, I.

    1990-01-01

    ORFEUS (Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer) is a 1 m normal incidence telescope for spectroscopic investigations of cosmic sources in the far and extreme ultraviolet spectral range. The instrument will be integrated into the freeflyer platform ASTRO-SPAS. ORFEUS-SPAS is scheduled with STS ENDEAVOUR in September 1992. We describe the telescope with its two spectrometer and their capabilities i.e., spectral range, resolution and overall sensitivity. The main classes of objects to be observed with the instrument are discussed and two examples of simulated spectra for the white dwarf HZ43 and an O9-star in LMC are shown.

  20. Defect-tolerant extreme ultraviolet nanoscale printing.

    PubMed

    Urbanski, L; Isoyan, A; Stein, A; Rocca, J J; Menoni, C S; Marconi, M C

    2012-09-01

    We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.

  1. Far and extreme ultraviolet astronomy with ORFEUS

    NASA Technical Reports Server (NTRS)

    Kraemer, G.; Barnstedt, J.; Eberhard, N.; Grewing, M.; Gringel, W.; Haas, C.; Kaelble, A.; Kappelmann, N.; Petrik, J.; Appenzeller, I.

    1990-01-01

    ORFEUS (Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer) is a 1 m normal incidence telescope for spectroscopic investigations of cosmic sources in the far and extreme ultraviolet spectral range. The instrument will be integrated into the freeflyer platform ASTRO-SPAS. ORFEUS-SPAS is scheduled with STS ENDEAVOUR in September 1992. We describe the telescope with its two spectrometer and their capabilities i.e., spectral range, resolution and overall sensitivity. The main classes of objects to be observed with the instrument are discussed and two examples of simulated spectra for the white dwarf HZ43 and an O9-star in LMC are shown.

  2. Temporal characterization of a time-compensated monochromator for high-efficiency selection of extreme-ultraviolet pulses generated by high-order harmonics

    SciTech Connect

    Poletto, L.; Villoresi, P.; Benedetti, E.; Ferrari, F.; Stagira, S.; Sansone, G.; Nisoli, M.

    2008-07-15

    Ultrafast extreme-ultraviolet pulses are spectrally selected by a time-delay-compensated grating monochromator. The intrinsic very short duration of the pulses is obtained by exploiting the high-order harmonic generation process. The temporal characterization of the harmonic pulses is obtained using a cross-correlation method: pulses as short as 8 fs are measured at the output of the monochromator in the case of the 23rd harmonic. This value is in agreement with the expected duration of such pulses, indicating that the influence of the monochromator is negligible. The photon flux has been measured with a calibrated photodiode, pointing out the good efficiency of the monochromator, derived by the exploitation for the two gratings of the conical diffraction mounting.

  3. The extreme ultraviolet explorer archive

    NASA Astrophysics Data System (ADS)

    Polomski, E.; Drake, J. J.; Dobson, C.; Christian, C.

    1993-09-01

    The Extreme Ultrviolet Explorer (EUVE) public archive was created to handle the storage, maintenance, and distribution of EUVE data and ancillary documentation, information, and software. Access to the archive became available to the public on July 17, 1992, only 40 days after the launch of the EUVE satellite. A brief overview of the archive's contents and the various methods of access will be described.

  4. Forecasting solar extreme and far ultraviolet irradiance

    NASA Astrophysics Data System (ADS)

    Henney, C. J.; Hock, R. A.; Schooley, A. K.; Toussaint, W. A.; White, S. M.; Arge, C. N.

    2015-03-01

    A new method is presented to forecast the solar irradiance of selected wavelength ranges within the extreme ultraviolet (EUV) and far ultraviolet (FUV) bands. The technique is similar to a method recently published by Henney et al. (2012) to predict solar 10.7 cm (2.8 GHz) radio flux, abbreviated F10.7, utilizing advanced predictions of the global solar magnetic field generated by a flux transport model. In this and the previous study, we find good correlation between the absolute value of the observed photospheric magnetic field and selected EUV/FUV spectral bands. By evolving solar magnetic maps forward 1 to 7 days with a flux transport model, estimations of the Earth side solar magnetic field distribution are generated and used to forecast irradiance. For example, Pearson correlation coefficient values of 0.99, 0.99, and 0.98 are found for 1 day, 3 day, and 7 day predictions, respectively, of the EUV band from 29 to 32 nm. In the FUV, for example, the 160 to 165 nm spectral band, correlation values of 0.98, 0.97, and 0.96 are found for 1 day, 3 day, and 7 day predictions, respectively. In the previous study, the observed F10.7 signal is found to correlate well with strong magnetic field (i.e., sunspot) regions. Here we find that solar EUV and FUV signals are significantly correlated with the weaker magnetic fields associated with plage regions, suggesting that solar magnetic indices may provide an improved indicator (relative to the widely used F10.7 signal) of EUV and FUV nonflaring irradiance variability as input to ionospheric and thermospheric models.

  5. High-order nonlinear optical processes in ablated carbon-containing materials: Recent approaches in development of the nonlinear spectroscopy using harmonic generation in the extreme ultraviolet range

    NASA Astrophysics Data System (ADS)

    Ganeev, R. A.

    2017-08-01

    The nonlinear spectroscopy using harmonic generation in the extreme ultraviolet range became a versatile tool for the analysis of the optical, structural and morphological properties of matter. The carbon-contained materials have shown the advanced properties among other studied species, which allowed both the definition of the role of structural properties on the nonlinear optical response and the analysis of the fundamental features of carbon as the attractive material for generation of coherent short-wavelength radiation. We review the studies of the high-order harmonic generation by focusing ultrashort pulses into the plasmas produced during laser ablation of various organic compounds. We discuss the role of ionic transitions of ablated carbon-containing molecules on the harmonic yield. We also show the similarities and distinctions of the harmonic and plasma spectra of organic compounds and graphite. We discuss the studies of the generation of harmonics up to the 27th order (λ = 29.9 nm) of 806 nm radiation in the boron carbide plasma and analyze the advantages and disadvantages of this target compared with the ingredients comprising B4C (solid boron and graphite) by comparing plasma emission and harmonic spectra from three species. We also show that the coincidence of harmonic and plasma emission wavelengths in most cases does not cause the enhancement or decrease of the conversion efficiency of this harmonic.

  6. Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies

    SciTech Connect

    Wilson, Daniel; Rudolf, Denis Juschkin, Larissa; Weier, Christian; Adam, Roman; Schneider, Claus M.; Winkler, Gerrit; Frömter, Robert; Danylyuk, Serhiy; Bergmann, Klaus; Grützmacher, Detlev

    2014-10-15

    Generation of circularly polarized light in the extreme ultraviolet (EUV) spectral region (about 25 eV–250 eV) is highly desirable for applications in spectroscopy and microscopy but very challenging to achieve in a small-scale laboratory. We present a compact apparatus for generation of linearly and circularly polarized EUV radiation from a gas-discharge plasma light source between 50 eV and 70 eV photon energy. In this spectral range, the 3p absorption edges of Fe (54 eV), Co (60 eV), and Ni (67 eV) offer a high magnetic contrast often employed for magneto-optical and electron spectroscopy as well as for magnetic imaging. We simulated and designed an instrument for generation of linearly and circularly polarized EUV radiation and performed polarimetric measurements of the degree of linear and circular polarization. Furthermore, we demonstrate first measurements of the X-ray magnetic circular dichroism at the Co 3p absorption edge with a plasma-based EUV light source. Our approach opens the door for laboratory-based, element-selective spectroscopy of magnetic materials and spectro-microscopy of ferromagnetic domains.

  7. Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies.

    PubMed

    Wilson, Daniel; Rudolf, Denis; Weier, Christian; Adam, Roman; Winkler, Gerrit; Frömter, Robert; Danylyuk, Serhiy; Bergmann, Klaus; Grützmacher, Detlev; Schneider, Claus M; Juschkin, Larissa

    2014-10-01

    Generation of circularly polarized light in the extreme ultraviolet (EUV) spectral region (about 25 eV-250 eV) is highly desirable for applications in spectroscopy and microscopy but very challenging to achieve in a small-scale laboratory. We present a compact apparatus for generation of linearly and circularly polarized EUV radiation from a gas-discharge plasma light source between 50 eV and 70 eV photon energy. In this spectral range, the 3p absorption edges of Fe (54 eV), Co (60 eV), and Ni (67 eV) offer a high magnetic contrast often employed for magneto-optical and electron spectroscopy as well as for magnetic imaging. We simulated and designed an instrument for generation of linearly and circularly polarized EUV radiation and performed polarimetric measurements of the degree of linear and circular polarization. Furthermore, we demonstrate first measurements of the X-ray magnetic circular dichroism at the Co 3p absorption edge with a plasma-based EUV light source. Our approach opens the door for laboratory-based, element-selective spectroscopy of magnetic materials and spectro-microscopy of ferromagnetic domains.

  8. Mitigation of fast ions generated from laser-produced Sn plasma for extreme ultraviolet light source by H{sub 2} gas

    SciTech Connect

    Nakamura, Daisuke; Tamaru, Koji; Hashimoto, Yuki; Okada, Tatsuo; Tanaka, Hiroki; Takahashi, Akihiko

    2007-12-15

    One of the serious problems in the laser-produced plasma for an extreme ultraviolet (EUV) light source used for the next generation lithography is the generation of fast ions that damage the EUV collector optics. In this study, the mitigation of fast ions from a laser-produced Sn plasma by a H{sub 2} background gas was investigated. It has been confirmed that H{sub 2} buffer gas at a pressure of 13.3 Pa has little influence on the transmission of 13.5 nm light with an optical path length of 200 mm. The sputtering of a dummy mirror by the fast ions generated from the laser-produced Sn plasma and their mitigation were investigated by visualizing the spatial distributions of sputtered atoms using the laser-induced fluorescence (LIF) imaging method. It was evaluated that the sputtering rate by the fast ions was reduced to less than approximately 5% by H{sub 2} gas with a column density of 1.2x10{sup 21} l/m{sup 2}. The dynamics and the chemical reaction of the plasma plume containing the high energy and high density ions in a H{sub 2} background gas were also investigated by a time-resolved emission spectroscopy as well as by LIF.

  9. Coherence techniques at extreme ultraviolet wavelengths

    SciTech Connect

    Chang, Chang

    2002-01-01

    The renaissance of Extreme Ultraviolet (EUV) and soft x-ray (SXR) optics in recent years is mainly driven by the desire of printing and observing ever smaller features, as in lithography and microscopy. This attribute is complemented by the unique opportunity for element specific identification presented by the large number of atomic resonances, essentially for all materials in this range of photon energies. Together, these have driven the need for new short-wavelength radiation sources (e.g. third generation synchrotron radiation facilities), and novel optical components, that in turn permit new research in areas that have not yet been fully explored. This dissertation is directed towards advancing this new field by contributing to the characterization of spatial coherence properties of undulator radiation and, for the first time, introducing Fourier optical elements to this short-wavelength spectral region. The first experiment in this dissertation uses the Thompson-Wolf two-pinhole method to characterize the spatial coherence properties of the undulator radiation at Beamline 12 of the Advanced Light Source. High spatial coherence EUV radiation is demonstrated with appropriate spatial filtering. The effects of small vertical source size and beamline apertures are observed. The difference in the measured horizontal and vertical coherence profile evokes further theoretical studies on coherence propagation of an EUV undulator beamline. A numerical simulation based on the Huygens-Fresnel principle is performed.

  10. The Stellar Extreme-Ultraviolet Radiation Field

    NASA Astrophysics Data System (ADS)

    Vallerga, John

    1998-04-01

    The local extreme ultraviolet (EUV) radiation field from stellar sources has been determined by combining the EUV spectra of 54 stars, taken with the spectrometers aboard the Extreme Ultraviolet Explorer satellite. The resultant spectrum over the range 70-730 Å is estimated to be 95% complete above 400 Å and 90% complete above 200 Å. The flux contributed by two B stars and three hot white dwarfs dominate the spectrum except at the shortest wavelengths, where an assortment of EUV source types contribute. The high electron densities measured toward nearby stars can be accounted for by photoionization from this radiation field, but the spectrum is too soft to explain the overionization of helium with respect to hydrogen recently measure in the Local Cloud.

  11. Extreme Ultraviolet Explorer Science Operation Center

    NASA Technical Reports Server (NTRS)

    Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

    1993-01-01

    The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

  12. Extreme Ultraviolet Explorer Science Operation Center

    NASA Technical Reports Server (NTRS)

    Wong, G. S.; Kronberg, F. A.; Meriwether, H. D.; Wong, L. S.; Grassi, C. L.

    1993-01-01

    The EUVE Science Operations Center (ESOC) is a satellite payload operations center for the Extreme Ultraviolet Explorer project, located on the Berkeley campus of the University of California. The ESOC has the primary responsibility for commanding the EUVE telescopes and monitoring their telemetry. The ESOC is one of a very few university-based satellite operations facilities operating with NASA. This article describes the history, operation, and advantages of the ESOC as an on-campus operations center.

  13. Waveform-controlled near-single-cycle milli-joule laser pulses generate sub-10 nm extreme ultraviolet continua.

    PubMed

    Schweinberger, Wolfgang; Sommer, Annkatrin; Bothschafter, Elisabeth; Li, Jiang; Krausz, Ferenc; Kienberger, Reinhard; Schultze, Martin

    2012-09-01

    We demonstrate the generation of waveform-controlled laser pulses with 1 mJ pulse energy and a full-width-half-maximum duration of ∼4  fs, therefore lasting less than two cycles of the electric field oscillating at their carrier frequency. The laser source is carrier-envelope-phase stabilized and used as the backbone of a kHz repetition rate source of high-harmonic continua with unprecedented flux at photon energies between 100 and 200 eV (corresponding to a wavelength range between 12-6 nm respectively). In combination we use these tools for the complete temporal characterization of the laser pulses via attosecond streaking spectroscopy.

  14. Numerical and theoretical study of the generation of extreme ultraviolet radiation by relativistic laser interaction with a grating

    SciTech Connect

    Lavocat-Dubuis, X.; Matte, J.-P.

    2010-09-15

    The generation of harmonics by the interaction of a femtosecond, relativistic intensity laser pulse with a grating of subwavelength periodicity was studied numerically and theoretically. For normal incidence, strong, coherent emission at the wavelength of the grating period and its harmonics is obtained, nearly parallel to the target surface, due to relativistic electron bunches emanating from each protuberance. For oblique incidence (30 deg.), only even harmonics of the grating periodicity are seen, but with an even higher intensity. This is due to constructive interference of the emission from the grating protuberances. The emission along the grating surface is composed of trains of attosecond pulses; therefore there is no need to use a filter. An efficiency greater than 10{sup -4} is obtained for the 24th harmonic. The conversion efficiency is fairly constant when the similarity parameter S=n{sub e}/(a{sub 0}n{sub c})({proportional_to}n{sub e{lambda}L}/I{sub L}{sup 1/2}) is held fixed, and is optimum when S{approx_equal}4. Here, n{sub e} and n{sub c} are the electron density and the critical density; a{sub 0}=eE{sub L}/(m{sub e{omega}L}c) is the quiver momentum in the laser field E{sub L} normalized to m{sub e}c.

  15. Gradient-based inverse extreme ultraviolet lithography.

    PubMed

    Ma, Xu; Wang, Jie; Chen, Xuanbo; Li, Yanqiu; Arce, Gonzalo R

    2015-08-20

    Extreme ultraviolet (EUV) lithography is the most promising successor of current deep ultraviolet (DUV) lithography. The very short wavelength, reflective optics, and nontelecentric structure of EUV lithography systems bring in different imaging phenomena into the lithographic image synthesis problem. This paper develops a gradient-based inverse algorithm for EUV lithography systems to effectively improve the image fidelity by comprehensively compensating the optical proximity effect, flare, photoresist, and mask shadowing effects. A block-based method is applied to iteratively optimize the main features and subresolution assist features (SRAFs) of mask patterns, while simultaneously preserving the mask manufacturability. The mask shadowing effect may be compensated by a retargeting method based on a calibrated shadowing model. Illustrative simulations at 22 and 16 nm technology nodes are presented to validate the effectiveness of the proposed methods.

  16. Extreme-Ultraviolet Vortices from a Free-Electron Laser

    NASA Astrophysics Data System (ADS)

    Rebernik Ribič, Primož; Rösner, Benedikt; Gauthier, David; Allaria, Enrico; Döring, Florian; Foglia, Laura; Giannessi, Luca; Mahne, Nicola; Manfredda, Michele; Masciovecchio, Claudio; Mincigrucci, Riccardo; Mirian, Najmeh; Principi, Emiliano; Roussel, Eléonore; Simoncig, Alberto; Spampinati, Simone; David, Christian; De Ninno, Giovanni

    2017-07-01

    Extreme-ultraviolet vortices may be exploited to steer the magnetic properties of nanoparticles, increase the resolution in microscopy, and gain insight into local symmetry and chirality of a material; they might even be used to increase the bandwidth in long-distance space communications. However, in contrast to the generation of vortex beams in the infrared and visible spectral regions, production of intense, extreme-ultraviolet and x-ray optical vortices still remains a challenge. Here, we present an in-situ and an ex-situ technique for generating intense, femtosecond, coherent optical vortices at a free-electron laser in the extreme ultraviolet. The first method takes advantage of nonlinear harmonic generation in a helical undulator, producing vortex beams at the second harmonic without the need for additional optical elements, while the latter one relies on the use of a spiral zone plate to generate a focused, micron-size optical vortex with a peak intensity approaching 1014 W /cm2 , paving the way to nonlinear optical experiments with vortex beams at short wavelengths.

  17. Experimental limits of the extreme ultraviolet background

    NASA Technical Reports Server (NTRS)

    Wulf-Mathies, C.; Grewing, M.; Kraemer, G.; Schulz-Luepertz, E.; Kimble, R.; Bixler, J.; Bowyer, S.

    1983-01-01

    Photometric observations of the diffuse extreme ultraviolet background with two photometers having bandpasses of 750-940 A and 1040-1080 A are reported. The payload, which was flown aboard an ARIES sounding rocket in June 1982, is described, including the electron detectors, filters, and calibration. The operation of the probe during the experiment, including its motions, are described. The primary experiment involved spectroscopic observation of the hot white dwarf HZ43. The photometer count rate is shown and the measurements of the diffuse background are compared with theoretical predictions. Despite the lower limits obtained using a narrowband detector, the measurements are not sensitive enough to draw any relevant astrophysical conclusions.

  18. Subresolution assist features in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Civay, Deniz; Verduijn, Erik; Clifford, Chris; Mangat, Pawitter; Wallow, Tom

    2015-04-01

    Lithographic critical dimension (CD) printing variability can be easily captured with a CD uniformity measurement; however, minimizing the variability is a challenging task that requires manipulation of many variables. Contact hole variability has a direct impact on device performance, while via variability affects metal area scaling and design. Subresolution assist features (SRAFs) have been used in the past to improve lithographic printing variability. SRAFs enhance the image log slope of nearby features but are not intended to print themselves. The role of SRAFs in extreme ultraviolet is explored here.

  19. Extreme Ultraviolet Explorer (EUVE): Emergency support

    NASA Technical Reports Server (NTRS)

    Zayas, H.; Barrowman, J.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) will conduct a survey of the entire celestial sphere in the extreme ultraviolet (UV) spectrum, 100 to 1000 angstrom units. This survey will be accomplished using four grazing incidence telescopes mounted on a spinning spacecraft whose spin axis is along the Sun line. Data is taken only when the spacecraft is in the Earth's shadow. The EUVE will be placed in a near circular orbit by a Delta expendable launch vehicle. The design orbit is circular at an altitude of 550 km by 28.5 degrees for a period of 96 minutes. The EUVE will be flown on a standardized Explorer Platform (EP) which will be reused for followup Explorer missions. Coverage will be provided by the Deep Space Network (DSN) for EUVE emergencies that would prevent communications via the normal channels of the Tracking and Data Relay Satellite System (TDRSS). Emergency support will be provided by the 26-meter subnet. Data is presented in tabular form for DSN support, frequency assignments, telemetry, and command.

  20. Extreme Ultraviolet Solar Spectroscopy with CHIPS

    NASA Astrophysics Data System (ADS)

    Hurwitz, Mark V.; Sasseen, T. P.; Sirk, M.; Marchant, W.; McDonald, J.; Thorsness, J.; Lewis, M.; Woods, T.

    2006-12-01

    The Cosmic Hot Interstellar Plasma Spectrometer (CHIPS) can be utilized to collect extreme ultraviolet spectra of the full solar disk. CHIPS has been collecting solar spectra since late 2005, although the observation geometry was not standardized until April 2006. Since that time, CHIPS has been accumulating spectra on nearly a daily basis. As for the diffuse emission that CHIPS was designed to observe, the bandpass is about 90 to 260 Å, with a peak resolution (λ/Δλ) of about 100. The instrumental efficiency as a function of wavelength is expected to be stable, but is subject to an overall scale factor that is less certain. We explain how CHIPS can collect these spectra, and present representative results.

  1. Absolute sensitivity calibration of extreme ultraviolet photoresists

    SciTech Connect

    Jones, Juanita; Naulleau, Patrick P.; Gullikson, Eric M.; Aquila, Andrew; George, Simi; Niakoula, Dimitra

    2008-05-16

    One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity, line-edge roughness, and resolution requirement. Sensitivity is of particular concern owing to its direct impact on source power requirements. Most current EUV exposure tools have been calibrated against a resist standard with the actual calibration of the standard resist dating back to EUV exposures at Sandia National Laboratories in the mid 1990s. Here they report on an independent sensitivity calibration of two baseline resists from the SEMATECH Berkeley MET tool performed at the Advanced Light Source Calibrations and Standards beamline. The results show the baseline resists to be approximately 1.9 times faster than previously thought based on calibration against the long standing resist standard.

  2. Femtosecond transparency in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Tarana, Michal; Greene, Chris H.

    2012-06-01

    Electromagnetically induced transparency-like behavior in the extreme ultraviolet (XUV) is studied theoretically, including the effect of intense 800nm laser dressing of He 2s2p(^1P^o) and 2p^2(^2S^e) autoionizing states. We present an ab initio solution of the time-dependent Schr"odinger equation in an LS-coupling configuration interaction basis set. The method enables a rigorous treatment of optical field ionization of these coupled autoionizing states into the N = 2 continuum in addition to N = 1. Our calculated transient absorption spectra show the formation of the Autler-Townes doublet in the presence of the dressing laser field. The presented results are in encouraging agreement with experiment [1]. [4pt] [1] Z.H. Loh, C.H. Greene, and S. R. Leone, Chem. Phys. 350, 7 (2008)

  3. Absolute sensitivity calibration of extreme ultraviolet photoresists.

    PubMed

    Naulleau, Patrick P; Gullikson, Eric M; Aquila, Andrew; George, Simi; Niakoula, Dimitra

    2008-07-21

    One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity, line-edge roughness, and resolution requirement. Sensitivity is of particular concern owing to its direct impact on source power requirements. Most current EUV exposure tools have been calibrated against a resist standard with the actual calibration of the standard resist dating back to EUV exposures at Sandia National Laboratories in the mid 1990s. Here we report on an independent sensitivity calibration of two baseline resists from the SEMATECH Berkeley MET tool performed at the Advanced Light Source Calibrations and Standards beamline. The results show the baseline resists to be approximately 1.9 times faster than previously thought based on calibration against the long standing resist standard.

  4. Extreme ultraviolet spectral irradiance measurements since 1946

    NASA Astrophysics Data System (ADS)

    Schmidtke, G.

    2015-03-01

    In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial

  5. High intensity vacuum ultraviolet and extreme ultraviolet production by noncollinear mixing in laser vaporized media

    SciTech Connect

    Todt, Michael A.; Albert, Daniel R.; Davis, H. Floyd

    2016-06-15

    A method is described for generating intense pulsed vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) laser radiation by resonance enhanced four-wave mixing of commercial pulsed nanosecond lasers in laser vaporized mercury under windowless conditions. By employing noncollinear mixing of the input beams, the need of dispersive elements such as gratings for separating the VUV/XUV from the residual UV and visible beams is eliminated. A number of schemes are described, facilitating access to the 9.9–14.6 eV range. A simple and convenient scheme for generating wavelengths of 125 nm, 112 nm, and 104 nm (10 eV, 11 eV, and 12 eV) using two dye lasers without the need for dye changes is described.

  6. High intensity vacuum ultraviolet and extreme ultraviolet production by noncollinear mixing in laser vaporized media

    NASA Astrophysics Data System (ADS)

    Todt, Michael A.; Albert, Daniel R.; Davis, H. Floyd

    2016-06-01

    A method is described for generating intense pulsed vacuum ultraviolet (VUV) and extreme ultraviolet (XUV) laser radiation by resonance enhanced four-wave mixing of commercial pulsed nanosecond lasers in laser vaporized mercury under windowless conditions. By employing noncollinear mixing of the input beams, the need of dispersive elements such as gratings for separating the VUV/XUV from the residual UV and visible beams is eliminated. A number of schemes are described, facilitating access to the 9.9-14.6 eV range. A simple and convenient scheme for generating wavelengths of 125 nm, 112 nm, and 104 nm (10 eV, 11 eV, and 12 eV) using two dye lasers without the need for dye changes is described.

  7. Extreme ultraviolet spectrometer based on a transmission electron microscopy grid

    SciTech Connect

    Sistrunk, Emily; Gühr, Markus

    2014-12-12

    Here, we performed extreme ultraviolet spectroscopy using an 80 lines/mm transmission electron microscope mesh as the dispersive element. We also present the usefulness of this instrument for dispersing a high harmonic spectrum from the 13th to the 29th harmonic of a Ti:sapph laser, corresponding to a wavelength range from 60 to 27 nm. The resolution of the instrument is limited by the image size of the high harmonic generation region on the detector. Finally, the resolution in first order diffraction is under 2 nm over the entire spectral range with a resolving power around 30.

  8. Rabi oscillations in extreme ultraviolet ionization of atomic argon

    NASA Astrophysics Data System (ADS)

    Flögel, Martin; Durá, Judith; Schütte, Bernd; Ivanov, Misha; Rouzée, Arnaud; Vrakking, Marc J. J.

    2017-02-01

    We demonstrate Rabi oscillations in nonlinear ionization of argon by an intense femtosecond extreme ultraviolet (XUV) laser field produced by high-harmonic generation. We monitor the formation of A r2 + as a function of the time delay between the XUV pulse and an additional near-infrared (NIR) femtosecond laser pulse, and show that the population of an A r+* intermediate resonance exhibits strong modulations both due to an NIR laser-induced Stark shift and XUV-induced Rabi cycling between the ground state of A r+ and the A r+* excited state. Our experiment represents a direct experimental observation of a Rabi-cycling process in the XUV regime.

  9. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 μm wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  10. The Extreme Ultraviolet Problem of Cataclysmic Variables

    NASA Astrophysics Data System (ADS)

    Warren, John Kennedy

    Observations of EUV radiation of astrophysical sources provide direct information of the accretion energy balance and the nature of the accretion region on the white dwarf surface of cataclysmic variable stars (CV's). Unattainable until recently, these EUV observation have been made possible with new satellites such as the Extreme Ultraviolet Explorer (EUVE) and the Array of Low Energy X-ray Imaging Sensors (ALEXIS). I document the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. The transient was probably caused by the intermittent accretion onto the white dwarf surface of dense filaments of matter, formed by an instability at the secondary star surface. Alternatively, the events may have been the EUV component of magnetic flares. I also document the first EUV pointed observation of an eclipsing magnetic cataclysmic variable, providing a first direct and unadulterated view of an EUV accretion spot on the white dwarf of a magnetic cataclysmic variable, and providing evidence for an EUV accretion region with vertical extent. Finally, I use the EUVE observations to place constraints on the accretion energy balance relationship in magnetic CV's, and discuss the implications of these and other EUV observations of magnetic CV's, using their newly-constrained energy balance relationships, to address accretion mechanisms and geometry.

  11. Extreme ultraviolet-induced photoionized plasmas

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemyslaw; Fiedorowicz, Henryk; Fok, Tomasz; Jarocki, Roman; Szczurek, Miroslaw

    2014-05-01

    In this work photoionized plasmas were created by irradiation of He or Ne gases with a focused extreme ultraviolet (EUV) beam from one of two laser-plasma sources employing Nd:YAG laser systems. The first of them was a 10 Hz laser-plasma EUV source, based on a double-stream gas-puff target, irradiated with a 3 ns per 0.8 J laser pulse. EUV radiation in this case was focused using a gold-plated grazing incidence ellipsoidal collector. The second source was based on a 10 ns per 10 J per 10 Hz laser system. In this case EUV radiation was focused using a gold-plated grazing incidence multifoil collector. Gases were injected into the interaction region, perpendicularly to an optical axis of the irradiation system, using an auxiliary gas puff valve. Spectral measurements in the EUV range were performed. In all cases the most intense emission lines were assigned to singly charged ions. The other emission lines belong to atoms or doubly charged ions.

  12. Spectral observations of the extreme ultraviolet background.

    PubMed

    Labov, S E; Bowyer, S

    1991-04-20

    A grazing incidence spectrometer was designed to measure the diffuse extreme ultraviolet background. It was flown on a sounding rocket, and data were obtained on the diffuse background between 80 and 650 angstroms. These are the first spectral measurements of this background below 520 angstroms. Several emission features were detected, including interplanetary He I 584 angstroms emission and geocoronal He II 304 angstroms emission. Other features observed may originate in a hot ionized interstellar gas, but if this interpretation is correct, gas at several different temperatures is present. The strongest of these features is consistent with O V emission at 630 angstroms. This emission, when combined with upper limits for other lines, restricts the temperature of this component to 5.5 < log T < 5.7, in agreement with temperatures derived from O VI absorption studies. A power-law distribution of temperatures is consistent with this feature only if the power-law coefficient is negative, as is predicted for saturated evaporation of clouds in a hot medium. In this case, the O VI absorption data confine the filling factor of the emission of f < or = 4% and the pressure to more than 3.7 x 10(4) cm-3 K, substantially above ambient interstellar pressure. Such a pressure enhancement has been predicted for clouds undergoing saturated evaporation. Alternatively, if the O V emission covers a considerable fraction of the sky, it would be a major source of ionization. A feature centered at about 99 angstroms is well fitted by a cluster of Fe XVIII and Fe XIX lines from gas at log T = 6.6-6.8. These results are consistent with previous soft X-ray observations with low-resolution detectors. A feature found near 178 angstroms is consistent with Fe X and Fe XI emission from gas at log T = 6; this result is consistent with results from experiments employing broad-band soft X-ray detectors.

  13. The Extreme Ultraviolet Variability of Quasars

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Marziani, Paola; Zhang, Shaohua; Muzahid, Sowgat; O'Dea, Christopher P.

    2016-10-01

    We study the extreme ultraviolet (EUV) variability (rest frame wavelengths 500-920 Å) of high-luminosity quasars using Hubble Space Telescope (HST) (low to intermediate redshift sample) and Sloan Digital sky Survey (SDSS) (high redshift sample) archives. The combined HST and SDSS data indicates a much more pronounced variability when the sampling time between observations in the quasar rest frame is \\gt 2× {10}7 {{s}} compared to \\lt 1.5× {10}7 s. Based on an excess variance analysis, for time intervals \\lt 2× {10}7 {{s}} in the quasar rest frame, 10% of the quasars (4/40) show evidence of EUV variability. Similarly, for time intervals \\gt 2× {10}7 {{s}} in the quasar rest frame, 55% of the quasars (21/38) show evidence of EUV variability. The propensity for variability does not show any statistically significant change between 2.5× {10}7 {{s}} and 3.16× {10}7 {{s}} (1 year). The temporal behavior is one of a threshold time interval for significant variability as opposed to a gradual increase on these timescales. A threshold timescale can indicate a characteristic spatial dimension of the EUV region. We explore this concept in the context of the slim disk models of accretion. We find that for rapidly spinning black holes, the radial infall time to the plunge region of the optically thin surface layer of the slim disk that is responsible for the preponderance of the EUV flux emission (primarily within 0-7 black hole radii from the inner edge of the disk) is consistent with the empirically determined variability timescale.

  14. Ultrafast Extreme Ultraviolet Absorption Spectroscopy of Methylammonium Lead Iodide Perovskite

    NASA Astrophysics Data System (ADS)

    Verkamp, Max A.; Lin, Ming-Fu; Ryland, Elizabeth S.; Vura-Weis, Josh

    2016-06-01

    Methylammonium lead iodide (perovskite) is a leading candidate for use in next-generation solar cell devices. However, the photophysics responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) absorption was used to investigate electron and hole dynamics in perovskite by observing transitions from a common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation with a broad spectrum (40-70 eV) were generated via high-harmonic generation using a tabletop instrument. Transient absorption measurements with visible pump and XUV probe directly observed the relaxation of charge carriers in perovskite after above-band excitation in the femtosecond and picosecond time ranges.

  15. Sensitivity calibration of an imaging extreme ultraviolet spectrometer-detector system for determining the efficiency of broadband extreme ultraviolet sources

    NASA Astrophysics Data System (ADS)

    Fuchs, S.; Rödel, C.; Krebs, M.; Hädrich, S.; Bierbach, J.; Paz, A. E.; Kuschel, S.; Wünsche, M.; Hilbert, V.; Zastrau, U.; Förster, E.; Limpert, J.; Paulus, G. G.

    2013-02-01

    We report on the absolute sensitivity calibration of an extreme ultraviolet (XUV) spectrometer system that is frequently employed to study emission from short-pulse laser experiments. The XUV spectrometer, consisting of a toroidal mirror and a transmission grating, was characterized at a synchrotron source in respect of the ratio of the detected to the incident photon flux at photon energies ranging from 15.5 eV to 99 eV. The absolute calibration allows the determination of the XUV photon number emitted by laser-based XUV sources, e.g., high-harmonic generation from plasma surfaces or in gaseous media. We have demonstrated high-harmonic generation in gases and plasma surfaces providing 2.3 μW and μJ per harmonic using the respective generation mechanisms.

  16. Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

    NASA Astrophysics Data System (ADS)

    Kyser, David F.; Eib, Nicholas K.; Ritchie, Nicholas W. M.

    2016-07-01

    The absorbed energy density (eV/cm3) deposited by extreme ultraviolet (EUV) photons and electron beam (EB) high-keV electrons is proposed as a metric for characterizing the sensitivity of EUV resist films. Simulations of energy deposition are used to calculate the energy density as a function of the incident aerial flux (EUV: mJ/cm2, EB: μC/cm2). Monte Carlo calculations for electron exposure are utilized, and a Lambert-Beer model for EUV absorption. The ratio of electron flux to photon flux which results in equivalent energy density is calculated for a typical organic chemically amplified resist film and a typical inorganic metal-oxide film. This ratio can be used to screen EUV resist materials with EB measurements and accelerate advances in EUV resist systems.

  17. Bidirectional reflectance distribution function of diffuse extreme ultraviolet scatterers and extreme ultraviolet baffle materials.

    PubMed

    Newell, M P; Keski-Kuha, R A

    1997-08-01

    Bidirectional reflectance distribution function (BRDF) measurements of a number of diffuse extreme ultraviolet (EUV) scatterers and EUV baffle materials have been performed with the Goddard EUV scatterometer. BRDF data are presented for white Spectralon SRS-99 at 121.6 nm; the data exhibit a non-Lambertian nature and a total hemispherical reflectance lower than 0.15. Data are also presented for an evaporated Cu black sample, a black Spectralon SRS-02 sample, and a Martin Optical Black sample at wavelengths of 58.4 and 121.6 nm and for angles of incidence of 15 degrees and 45 degrees. Overall Martin Optical Black exhibited the lowest BRDF characteristic, with a total hemispherical reflectance of the order of 0.01 and measured BRDF values as low as 2 x 10(-3) sr(-1).

  18. High-intensity source of extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Paresce, E.; Kumar, S.; Bowyer, S.

    1972-01-01

    High intensity ultraviolet radiation source was developed which is suitable for emission below 500 A. Source, useful for 100 to 1000 A range, is simple and inexpensive to construct, easy to operate, and very stable. Because of sufficiently intense output spectrum, source can be used with monochromator at wavelengths as low as 160 A.

  19. Source development for extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, G.; Dunne, P.; Kilbane, D.; Liu, L.; Lokasani, R.; Long, E.; Li, B. W.; McCormack, T.; O'Reilly, F.; Shiel, J.; Sokell, E.; Suzuki, C.; Wu, T.; Higashiguchi, T.

    2017-03-01

    Sources based on laser produced plasmas of tin (Sn) are currently being developed for extreme ultraviolet lithography for semiconductor fabrication. Since they operate at short wavelength (13.5 nm) they are capable of producing features with critical dimensions in the 10 nm range. Already next generation lithography sources operating at an even lower wavelength of around 6.7-6.8 nm have been proposed and research is ongoing on their feasibility for both large scale manufacturing and `at wavelength' metrology. The high resolution afforded by such short wavelengths is also of use for applications such as surface patterning and microscopy and the results of recent experiments to identify sources for operation in the `water window' (2.34-4.2 nm), where carbon absorbs strongly but water does not are summarized.

  20. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y.; Rudenko, Artem; Herrwerth, O.; Foucar, L.; Kurka, M.; Kuhnel, K.; Lezius, M.; Kling, Matthias; van Tilborg, Jeroen; Belkacem, Ali; Ueda, K.; Dusterer, S.; Treusch, R.; Schroter, Claus-Dieter; Moshammer, Robbert; Ullrich, Joachim

    2011-06-17

    Ultrafast isomerization of acetylene cations ([HC = CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +} + CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52 {+-} 15 fs in a kinetic energy release (KER) window of 5.8 < KER < 8 eV, providing clear evidence for the existence of a fast, nonradiative decay channel.

  1. Ultrafast Extreme Ultraviolet Induced Isomerization of Acetylene Cations

    SciTech Connect

    Jiang, Y. H.; Kurka, M.; Kuehnel, K. U.; Schroeter, C. D.; Moshammer, R.; Rudenko, A.; Foucar, L.; Herrwerth, O.; Lezius, M.; Kling, M. F.; Tilborg, J. van; Belkacem, A.; Ueda, K.; Duesterer, S.; Treusch, R.; Ullrich, J.

    2010-12-31

    Ultrafast isomerization of acetylene cations ([HC=CH]{sup +}) in the low-lying excited A{sup 2}{Sigma}{sub g}{sup +} state, populated by the absorption of extreme ultraviolet (XUV) photons (38 eV), has been observed at the Free Electron Laser in Hamburg, (FLASH). Recording coincident fragments C{sup +}+CH{sub 2}{sup +} as a function of time between XUV-pump and -probe pulses, generated by a split-mirror device, we find an isomerization time of 52{+-}15 fs in a kinetic energy release (KER) window of 5.8

  2. X Ray, Far, and Extreme Ultraviolet Coatings for Space Applications

    NASA Technical Reports Server (NTRS)

    Zukic, M.; Torr, D. G.

    1993-01-01

    The idea of utilizing imaging mirrors as narrow band filters constitutes the basis of the design of extreme ultraviolet imagers operating at 58.4 nm and 83.4 nm. The net throughput of both imaging-filtering systems is better than 20 percent. The superiority of the EUV self-filtering camera/telescope becomes apparent when compared to previously theoretically designed 83.4-nm filtering-imaging systems, which yielded transmissions of less than a few percent and therefore less than 0.1 percent throughput when combined with at least two imaging mirrors. Utilizing the self-filtering approach, instruments with similar performances are possible for imaging at other EUV wavelengths, such as 30.4 nm. The self-filtering concept is extended to the X-ray region where its application can result in the new generation of X-ray telescopes, which could replace current designs based on large and heavy collimators.

  3. Extreme ultraviolet photodissociative excitation of molecular oxygen

    NASA Technical Reports Server (NTRS)

    Carlson, R. W.

    1974-01-01

    Photodissociation processes in molecular oxygen occurring in the wavelength range from 500 to 900 A, investigated through observations of the resulting atomic fluorescence radiation, are reported. The dispersed radiation from a continuous light source was used to excite the gas, and the resulting fluorescence radiation was observed in the ultraviolet and infrared. The results obtained are compared with the dissociation cross sections derived by Matsunaga and Watanabe (1967).

  4. Comparing Vacuum and Extreme Ultraviolet Radiation for Postionization of Laser Desorbed Neutrals from Bacterial Biofilms and Organic Fullerene

    SciTech Connect

    Gaspera, Gerald L.; Takahashi, Lynelle K.; Zhou, Jia; Ahmed, Musahid; Moored, Jerry F.; Hanley, Luke

    2010-12-08

    Vacuum and extreme ultraviolet radiation from 8 - 24 eV generated at a synchrotron was used to postionize laser desorbed neutrals of antibiotic-treated biofilms and a modified fullerene using laser desorption postionization mass spectrometry (LDPI-MS). Results show detection of the parent ion, various fragments, and extracellular material from biofilms using LDPI-MS with both vacuum and extreme ultraviolet photons. Parent ions were observed for both cases, but extreme ultraviolet photons (16-24 eV) induced more fragmentation than vacuum ultraviolet (8-14 eV) photons.

  5. Extreme Ultraviolet (XUV) Coronal Spectroheliograph - Experiment S082A

    NASA Technical Reports Server (NTRS)

    1973-01-01

    This chart describes Skylab's Extreme Ultraviolet (XUV) Coronal Spectroheliograph, one of the eight Apollo Telescope Mount facilities. It was designed to sequentially photograph the solar chromosphere and corona in selected ultraviolet wavelengths . The instrument also obtained information about composition, temperature, energy conversion and transfer, and plasma processes of the chromosphere and lower corona. The Marshall Space Flight Center had program management responsibility for the development of Skylab hardware and experiments.

  6. Extreme Ultraviolet (XUV) Coronal Spectroheliograph - Experiment S082A

    NASA Technical Reports Server (NTRS)

    1971-01-01

    This photograph shows Skylab's Extreme Ultraviolet (XUV) Spectroheliograph during an acceptance test and checkout procedures in April 1971. The unit was an Apollo Telescope Mount (ATM) instrument designed to sequentially photograph the solar chromosphere and corona in selected ultraviolet wavelengths. The instrument also obtained information about composition, temperature, energy conversion and transfer, and plasma processes of the chromosphere and lower corona. The Marshall Space Flight Center had program management responsibility for the development of Skylab hardware and experiments.

  7. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

    PubMed

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  8. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

    PubMed Central

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B.; Vest, Robert E.; Lucatorto, Thomas B.

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase. PMID:27413610

  9. Compact X-Ray And Extreme-Ultraviolet Monochromator

    NASA Technical Reports Server (NTRS)

    Hoover, Richard B.

    1991-01-01

    Monochromator for x-ray and extreme-ultraviolet radiation provides higher spectral resolution than achieved with thin-metal-foil broad-band-pass filters. Uses Bragg reflection to band-pass-filter radiation from high-intensity, broad-spectrum source. Operates over much broader x-ray and extreme-ultraviolet spectrum than devices based upon natural crystals. Intended to filter continuum radiation from sources like synchrotrons, laser plasma sources, free-electron lasers, and wigglers to produce monochromatic beams for testing and analysis of x-ray and extreme-ultraviolet telescopes and microscopes, for calibration of photographic films and detectors, for biological and biomedical research, for x-ray lithography, for processing of materials, and for research in properties of materials.

  10. Four-wave mixing experiments with extreme ultraviolet transient gratings.

    PubMed

    Bencivenga, F; Cucini, R; Capotondi, F; Battistoni, A; Mincigrucci, R; Giangrisostomi, E; Gessini, A; Manfredda, M; Nikolov, I P; Pedersoli, E; Principi, E; Svetina, C; Parisse, P; Casolari, F; Danailov, M B; Kiskinova, M; Masciovecchio, C

    2015-04-09

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  11. Four-wave mixing experiments with extreme ultraviolet transient gratings

    NASA Astrophysics Data System (ADS)

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-04-01

    Four-wave mixing (FWM) processes, based on third-order nonlinear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enable the exploration of dynamics inaccessible by linear methods. The coherent and multi-wave nature of the FWM approach has been crucial in the development of advanced technologies, such as silicon photonics, subwavelength imaging and quantum communications. All these technologies operate at optical wavelengths, which limits the spatial resolution and does not allow the probing of excitations with energy in the electronvolt range. Extension to shorter wavelengths--that is, the extreme ultraviolet and soft-X-ray ranges--would allow the spatial resolution to be improved and the excitation energy range to be expanded, as well as enabling elemental selectivity to be achieved by exploiting core resonances. So far, FWM applications at such wavelengths have been prevented by the absence of coherent sources of sufficient brightness and of suitable experimental set-ups. Here we show how transient gratings, generated by the interference of coherent extreme-ultraviolet pulses delivered by the FERMI free-electron laser, can be used to stimulate FWM processes at suboptical wavelengths. Furthermore, we have demonstrated the possibility of observing the time evolution of the FWM signal, which shows the dynamics of coherent excitations as molecular vibrations. This result opens the way to FWM with nanometre spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics. The theoretical possibility of realizing these applications has already stimulated ongoing developments of free-electron lasers: our results show that FWM at suboptical wavelengths is feasible, and we hope that they will enable advances in present and future photon sources.

  12. Absolute, Extreme-Ultraviolet, Solar Spectral Irradiance Monitor (AESSIM)

    NASA Technical Reports Server (NTRS)

    Huber, Martin C. E.; Smith, Peter L.; Parkinson, W. H.; Kuehne, M.; Kock, M.

    1988-01-01

    AESSIM, the Absolute, Extreme-Ultraviolet, Solar Spectral Irradiance Monitor, is designed to measure the absolute solar spectral irradiance at extreme-ultraviolet (EUV) wavelengths. The data are required for studies of the processes that occur in the earth's upper atmosphere and for predictions of atmospheric drag on space vehicles. AESSIM is comprised of sun-pointed spectrometers and newly-developed, secondary standards of spectral irradiance for the EUV. Use of the in-orbit standard sources will eliminate the uncertainties caused by changes in spectrometer efficiency that have plagued all previous measurements of the solar spectral EUV flux.

  13. 'EXTREME ULTRAVIOLET WAVES' ARE WAVES: FIRST QUADRATURE OBSERVATIONS OF AN EXTREME ULTRAVIOLET WAVE FROM STEREO

    SciTech Connect

    Patsourakos, Spiros; Vourlidas, Angelos E-mail: vourlidas@nrl.navy.mil

    2009-08-01

    The nature of coronal mass ejection (CME)-associated low corona propagating disturbances, 'extreme ultraviolet (EUV) waves', has been controversial since their discovery by EIT on SOHO. The low-cadence, single-viewpoint EUV images and the lack of simultaneous inner corona white-light observations have hindered the resolution of the debate on whether they are true waves or just projections of the expanding CME. The operation of the twin EUV imagers and inner corona coronagraphs aboard STEREO has improved the situation dramatically. During early 2009, the STEREO Ahead (STA) and Behind (STB) spacecrafts observed the Sun in quadrature having a {approx}90 deg. angular separation. An EUV wave and CME erupted from active region 11012, on February 13, when the region was exactly at the limb for STA and hence at disk center for STB. The STEREO observations capture the development of a CME and its accompanying EUV wave not only with high cadence but also in quadrature. The resulting unprecedented data set allowed us to separate the CME structures from the EUV wave signatures and to determine without doubt the true nature of the wave. It is a fast-mode MHD wave after all.

  14. Research in extreme ultraviolet and far ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1987-01-01

    Analysis and interpretation continued on data generated by the flight of 27.086 in April of 1986 and by the successful UVX mission. Optical and mechanical design of the 1 meter EUV telescope, planned for launch with the large SPARTAN type carrier, ASTRO-SPAS, was also continued. The major effort centered on the preparation of flight 27.106, scheduled to launch in September, 1986. Work which was performed included: design of the skins and bulkheads; completion of the optical, mechanical, and electrical design; purchase of the major components of the instruments; assemblage of the electrical components; and performance of theoretical work, to support the data interpretation.

  15. Xe capillary target for laser-plasma extreme ultraviolet source

    SciTech Connect

    Inoue, Takahiro; Okino, Hideyasu; Nica, Petru Edward; Amano, Sho; Miyamoto, Shuji; Mochizuki, Takayasu

    2007-10-15

    A cryogenic Xe jet system with an annular nozzle has been developed in order to continuously fast supply a Xe capillary target for generating a laser-plasma extreme ultraviolet (EUV) source. The cooling power of the system was evaluated to be 54 W, and the temperature stability was {+-}0.5 K at a cooling temperature of about 180 K. We investigated experimentally the influence of pressure loss inside an annular nozzle on target formation by shortening the nozzle length. Spraying caused by cavitation was mostly suppressed by mitigating the pressure loss, and a focused jet was formed. Around a liquid-solid boundary, a solid-Xe capillary target (100/70 {mu}m {phi}) was formed with a velocity of {<=}0.01 m/s. Laser-plasma EUV generation was tested by focusing a Nd:YAG laser beam on the target. The results suggested that an even thinner-walled capillary target is required to realize the inertial confinement effect.

  16. Boron and silicon - Filters for the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Labov, S.; Bowyer, S.; Steele, G.

    1985-01-01

    Thin films of boron and silicon have been developed using electron beam deposition. The transmissions of these filters were measured from soft X-ray wavelengths to the far ultraviolet and at optical wavelengths. The boron filter transmission peaks near 66 A and the silicon filter peaks near 136 A as expected on theoretical grounds, but the extreme ultraviolet bandpass is narrower than expected. The peak transmission of these filters does not change with time, but the width of the silicon filter bandpass is reduced slightly as the filter ages.

  17. Science With The Extreme Ultraviolet Spectrometer For Solar Orbiter

    NASA Astrophysics Data System (ADS)

    Young, P. R.; EUS Science Working Group

    2007-01-01

    The CCLRC Rutherford Appleton Laboratory (UK) is leading a consortium that proposes to build an ultraviolet spectrometer for Solar Orbiter provisionally called the Extreme Ultraviolet Spectrometer (EUS). The selection of wavelength bands for EUS has been re-assessed by the EUS Science Working Group in recent months and the final decision calls for three wavelength bands covering 700-800 Å, 970-1040 Å, and 1163-1265 Å. The key features of these bands are summarised here, and particular science topics that can be addressed by EUS are discussed.

  18. Method for plasma formation for extreme ultraviolet lithography-theta pinch

    DOEpatents

    Hassanein, Ahmed; Konkashbaev, Isak; Rice, Bryan

    2007-02-20

    A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

  19. Extreme ultraviolet lithography mask etch study and overview

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  20. Multilayer reflective coatings for extreme-ultraviolet lithography

    SciTech Connect

    Montcalm, C., LLNL

    1998-03-10

    Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

  1. Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas.

    PubMed

    Zhao, H Y; Zhao, H W; Sun, L T; Zhang, X Z; Wang, H; Ma, B H; Li, X X; Zhu, Y H; Sheng, L S; Zhang, G B; Tian, Y C

    2008-02-01

    Extreme ultraviolet lithography (EUVL) is considered as the most promising solution at and below dynamic random access memory 32 nm half pitch among the next generation lithography, and EUV light sources with high output power and sufficient lifetime are crucial for the realization of EUVL. However, there is no EUV light source completely meeting the requirements for the commercial application in lithography yet. Therefore, ECR plasma is proposed as a novel concept EUV light source. In order to investigate the feasibility of ECR plasma as a EUV light source, the narrow band EUV power around 13.5 nm emitted by two highly charged ECR ion sources -- LECR2M and SECRAL -- was measured with a calibrated EUV power measurement tool. Since the emission lines around 13.5 nm can be attributed to the 4d-5p transitions of Xe XI or the 4d-4f unresolved transition array of Sn VIII-XIII, xenon plasma was investigated. The dependence of the EUV throughput and the corresponding conversion efficiency on the parameters of the ion source, such as the rf power and the magnetic confinement configurations, were preliminarily studied.

  2. Thin film filter lifetesting results in the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Vedder, P. W.; Vallerga, J. V.; Gibson, J. L.; Stock, J.; Siegmund, O. H. W.

    1993-01-01

    We present the results of the thin film filter lifetesting program conducted as part of the NASA Extreme Ultraviolet Explorer (EUVE) satellite mission. This lifetesting program is designed to monitor changes in the transmission and mechanical properties of the EUVE filters over the lifetime of the mission (fabrication, assembly, launch and operation). Witness test filters were fabricated from thin film foils identical to those used in the flight filters. The witness filters have been examined and calibrated periodically over the past seven years. The filters have been examined for evidence of pinholing, mechanical degradation, and oxidation. Absolute transmissions of the flight and witness filters have been measured in the extreme ultraviolet (EUV) over six orders of magnitude at numerous wavelengths using the Berkeley EUV Calibration Facility.

  3. Thin film filter lifetesting results in the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Vedder, P. W.; Vallerga, J. V.; Gibson, J. L.; Stock, J.; Siegmund, O. H. W.

    1993-01-01

    We present the results of the thin film filter lifetesting program conducted as part of the NASA Extreme Ultraviolet Explorer (EUVE) satellite mission. This lifetesting program is designed to monitor changes in the transmission and mechanical properties of the EUVE filters over the lifetime of the mission (fabrication, assembly, launch and operation). Witness test filters were fabricated from thin film foils identical to those used in the flight filters. The witness filters have been examined and calibrated periodically over the past seven years. The filters have been examined for evidence of pinholing, mechanical degradation, and oxidation. Absolute transmissions of the flight and witness filters have been measured in the extreme ultraviolet (EUV) over six orders of magnitude at numerous wavelengths using the Berkeley EUV Calibration Facility.

  4. Irradiation stability of silicon photodiodes for extreme-ultraviolet radiation

    NASA Astrophysics Data System (ADS)

    Scholze, Frank; Klein, Roman; Bock, Thomas

    2003-10-01

    Photodiodes are used as easy-to-operate detectors in the extreme-ultraviolet spectral range. At the Physikalisch-Technische Bundesanstalt photodiodes are calibrated with an uncertainty of spectral responsivity of 0.3% or less. Stable photodiodes are a prerequisite for the dissemination of these high-accuracy calibrations to customers. Silicon photodiodes with different top layers were exposed to intense extreme-ultraviolet irradiation. Diodes coated with diamondlike carbon or TiSiN proved to be stable within a few percent up to a radiant exposure of 100 kJ/cm2. The changes in responsivity could be explained as being due to carbon contamination and to changes in the internal charge collection efficiency. In ultrahigh vacuum, no indication of oxidation was found.

  5. Telescience - Concepts and contributions to the Extreme Ultraviolet Explorer mission

    NASA Technical Reports Server (NTRS)

    Marchant, Will; Dobson, Carl; Chakrabarti, Supriya; Malina, Roger F.

    1987-01-01

    It is shown how the contradictory goals of low-cost and fast data turnaround characterizing the Extreme Ultraviolet Explorer (EUVE) mission can be achieved via the early use of telescience style transparent tools and simulations. The use of transparent tools reduces the parallel development of capability while ensuring that valuable prelaunch experience is not lost in the operations phase. Efforts made to upgrade the 'EUVE electronics' simulator are described.

  6. Metrology of 13-nm optics for extreme ultraviolet lithography

    SciTech Connect

    Beckwith, J.F.; Patterson, S.R.; Thompson, D.C.; Badami, V.; Smith, S.

    1997-02-03

    This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry.

  7. Ultraviolet and extreme ultraviolet spectroscopy of the solar corona at the Naval Research Laboratory.

    PubMed

    Moses, J D; Ko, Y-K; Laming, J M; Provornikova, E A; Strachan, L; Beltran, S Tun

    2015-11-01

    We review the history of ultraviolet and extreme ultraviolet spectroscopy with a specific focus on such activities at the Naval Research Laboratory and on studies of the extended solar corona and solar-wind source regions. We describe the problem of forecasting solar energetic particle events and discuss an observational technique designed to solve this problem by detecting supra-thermal seed particles as extended wings on spectral lines. Such seed particles are believed to be a necessary prerequisite for particle acceleration by heliospheric shock waves driven by a coronal mass ejection.

  8. Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro

    2015-01-01

    In chemically amplified resists used for high-volume production of semiconductor devices, the control of acid catalytic reaction is essential for fine patterning. A basic compound, called a quencher, plays an important role in the control of acid catalytic reaction. In particular, the photodecomposable quencher is effective for the enhancement of the chemical gradient. In this study, the effects of photodecomposable quenchers on the dose shift (the deviation from the sizing dose) dependences of line width, line edge roughness (LER), and stochastic defect generation were investigated, assuming line-and-space patterns with 11 nm half-pitch. The exposure latitude of line width in a chemically amplified resist with photodecomposable quenchers was larger than that in a chemically amplified resist with conventional non-photodecomposable quenchers at sizing doses >20 mJ cm-2. By using photodecomposable quenchers, LER and the probability of stochastic defect generation were decreased, while the dose shift dependences of LER and stochastic defect generation did not significantly differ, compared with those observed using conventional non-photodecomposable quenchers.

  9. Ultrafast melting of spin density wave order in BaFe2As2 observed by time- and angle-resolved photoemission spectroscopy with extreme-ultraviolet higher harmonic generation

    NASA Astrophysics Data System (ADS)

    Suzuki, H.; Okazaki, K.; Yamamoto, T.; Someya, T.; Okada, M.; Koshiishi, K.; Fujisawa, M.; Kanai, T.; Ishii, N.; Nakajima, M.; Eisaki, H.; Ono, K.; Kumigashira, H.; Itatani, J.; Fujimori, A.; Shin, S.

    2017-04-01

    The transient single-particle spectral function of BaFe2As2 , a parent compound of iron-based superconductors, has been studied by time- and angle-resolved photoemission spectroscopy with an extreme-ultraviolet laser generated by higher harmonics from Ar gas, which enables us to investigate the dynamics in the entire Brillouin zone. We observed electronic modifications from the spin density wave (SDW) ordered state within ˜1 ps after the arrival of a 1.5 eV pump pulse. We observed optically excited electrons at the zone center above EF at 0.12 ps, and their rapid decay. After the fast decay of the optically excited electrons, a thermalized state appears and survives for a relatively long time. From a comparison with the density-functional theory band structure for the paramagnetic and SDW states, we interpret the experimental observations as the melting of the SDW. Exponential decay constants for the thermalized state to recover back to the SDW ground state are ˜0.60 ps both around the zone center and the zone corner.

  10. Silicon Lightweight Mirrors (SLMS) for Ultraviolet and Extreme Ultraviolet Imaging Mirrors

    NASA Technical Reports Server (NTRS)

    Goodman, W. A.; Keys, Andrew S. (Technical Monitor)

    2002-01-01

    Subtopic 01-S1.06 requires mirrors with a diameter of 0.5-2.4 meters, areal density less than 20 kg/sq m, a figure specification of 0.02-0.005 waves root mean square (rms) at 633 nanometers, a surface roughness 0.5-1 nanometers rms, and a midfrequency error of 1.0-2.5 nanometers rms for use in the infrared (IR) to extreme ultra violet (EUV) waveband. Schafer's Phase II objective is to use Silicon Lightweight Mirrors (SLMS), a novel, all-silicon, foam-core, lightweight mirror technology, to build three imaging mirrors for the Next Generation Space Telescope Near Infrared Camera (NIRCam) Engineering Test Unit: M0 (a flat), M2 (a concave sphere) and M3R (an oblate spheroid). The surface figure error specification for the NIRCam imaging mirrors is 8 nanometers rms (0.013 waves rms at 633 nanometers), equivalent to that required for ultraviolet (UV) and EUV mirrors, and this figure must be maintained at the 35 K operational temperature of NGST. The surface roughness required is 30 A rms since NIRCam operates in the visible to infrared (VIS/IR) (0.65-5 microns). We will produce mounts for mirrors M2 and M3R using the complementary thermally matched C/SiC material demonstrated by Schafer under another NASA SBIR, NAS8-98137.

  11. Relativistic frequency upshift to the extreme ultraviolet regime using self-induced oscillatory flying mirrors

    PubMed Central

    Kim, I Jong; Pae, Ki Hong; Kim, Chul Min; Kim, Hyung Taek; Yun, Hyeok; Yun, Sang Jae; Sung, Jae Hee; Lee, Seong Ku; Yoon, Jin Woo; Yu, Tae Jun; Jeong, Tae Moon; Nam, Chang Hee; Lee, Jongmin

    2012-01-01

    Coherent short-wavelength radiation from laser–plasma interactions is of increasing interest in disciplines including ultrafast biomolecular imaging and attosecond physics. Using solid targets instead of atomic gases could enable the generation of coherent extreme ultraviolet radiation with higher energy and more energetic photons. Here we present the generation of extreme ultraviolet radiation through coherent high-harmonic generation from self-induced oscillatory flying mirrors—a new-generation mechanism established in a long underdense plasma on a solid target. Using a 30-fs, 100-TW Ti:sapphire laser, we obtain wavelengths as short as 4.9 nm for an optimized level of amplified spontaneous emission. Particle-in-cell simulations show that oscillatory flying electron nanosheets form in a long underdense plasma, and suggest that the high-harmonic generation is caused by reflection of the laser pulse from electron nanosheets. We expect this extreme ultraviolet radiation to be valuable in realizing a compact X-ray instrument for research in biomolecular imaging and attosecond physics. PMID:23187631

  12. Calibration techniques for the NASA ICON Extreme Ultraviolet Spectrograph (EUV)

    NASA Astrophysics Data System (ADS)

    Ishikawa, Yuzo; Sirk, Martin; Wishnow, Ed; Korpela, Eric; Edelstein, Jerry; Curtis, James; Gibson, Steven R.; McCauley, Jeremy; McPhate, Jason; Smith, Christopher

    2016-09-01

    The Ionospheric Connection Explorer (ICON) is a NASA Heliophysics Explorer Mission designed to study the ionosphere. ICON will examine the Earth's upper atmosphere to better understand the relationship between Earth weather and space-weather drivers. ICON will accomplish its science objectives using a suite of 4 instruments, one of which is the Extreme Ultraviolet Spectrograph (EUV). EUV will measure daytime altitude intensity profile and spatial distribution of ionized oxygen emissions (O+ at 83.4 nm and 61.7 nm) on the limb in the thermosphere (100 to 500 km tangent altitude). EUV is a single-optic imaging spectrometer that observes in the extreme ultraviolet region of the spectrum. In this paper, we describe instrumental performance calibration measurement techniques and data analysis for EUV. Various measurements including Lyman-α scattering, instrumental and component efficiency, and field-of-view alignment verification were done in custom high-vacuum ultraviolet calibration facilities. Results from the measurements and analysis will be used to understand the instrument performance during the in-flight calibration and observations after launch.

  13. Extreme Ultraviolet Explorer. Long look at the next window

    NASA Technical Reports Server (NTRS)

    Maran, Stephen P.

    1991-01-01

    The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

  14. Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2001-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  15. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography

    DOEpatents

    Chapman, Henry N.; Nugent, Keith A.

    2002-01-01

    A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

  16. Four wave mixing experiments with extreme ultraviolet transient gratings

    PubMed Central

    Bencivenga, F.; Cucini, R.; Capotondi, F.; Battistoni, A.; Mincigrucci, R.; Giangrisostomi, E.; Gessini, A.; Manfredda, M.; Nikolov, I. P.; Pedersoli, E.; Principi, E.; Svetina, C.; Parisse, P.; Casolari, F.; Danailov, M. B.; Kiskinova, M.; Masciovecchio, C.

    2015-01-01

    Four wave mixing (FWM) processes, based on third-order non-linear light-matter interactions, can combine ultrafast time resolution with energy and wavevector selectivity, and enables to explore dynamics inaccessible by linear methods.1-7 The coherent and multi-wave nature of FWM approach has been crucial in the development of cutting edge technologies, such as silicon photonics,8 sub-wavelength imaging9 and quantum communications.10 All these technologies operate with optical wavelengths, which limit the spatial resolution and do not allow probing excitations with energy in the eV range. The extension to shorter wavelengths, that is the extreme ultraviolet (EUV) and soft-x-ray (SXR) range, will allow to improve the spatial resolution and to expand the excitation energy range, as well as to achieve elemental selectivity by exploiting core resonances.5-7,11-14 So far FWM applications at these wavelengths have been prevented by the absence of coherent sources of sufficient brightness and suitable experimental setups. Our results show how transient gratings, generated by the interference of coherent EUV pulses delivered by the FERMI free electron laser (FEL),15 can be used to stimulate FWM processes at sub-optical wavelengths. Furthermore, we have demonstrated the possibility to read the time evolution of the FWM signal, which embodies the dynamics of coherent excitations as molecular vibrations. This result opens the perspective for FWM with nanometer spatial resolution and elemental selectivity, which, for example, would enable the investigation of charge-transfer dynamics.5-7 The theoretical possibility to realize these applications have already stimulated dedicated and ongoing FEL developments;16-20 today our results show that FWM at sub-optical wavelengths is feasible and would be the spark to the further advancements of the present and new sources. PMID:25855456

  17. Line image sensors for spectroscopic applications in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Banyay, Matus; Brose, Sascha; Juschkin, Larissa

    2009-10-01

    The spectral range of extreme ultraviolet radiation (XUV or EUV) is an active area of research incorporating many scientific fields such as microscopy, lithography or reflectometry. During the last decade, a lot of effort has been put into transferring many of the known techniques developed at linear accelerators into the laboratory using discharge-produced plasmas (DPPs) or laser-produced plasmas (LPPs) as an alternative light source. In particular, the semiconductor industry is in need of on-site tools in the shorter wavelength range for production and inspection of structured surfaces with nanometer resolution. Here traditional charge coupled device (CCD) image sensors are inapplicable as detectors because of the strong absorption of XUV by matter prohibiting any generation of electron-hole pairs inside a deep lying p-n junction. As a solution, two-dimensional backthinned CCDs are available in the market offering high sensitivity to XUV light. Although for many applications a one-dimensional line scanning image sensor would be sufficient, they are non-existent for XUV. It is only lately that manufacturers have started to adopt the principle of backthinning to CCD line sensors to enhance sensitivity in the long wavelength UV range (>200 nm). Here we show that generally these compact sensors offer good quantum efficiencies in the XUV which make them a candidate for many spectroscopic applications and future industrial inline inspection tools for which costly two-dimensional CCDs are oversized. We have successfully implemented a compact sensor device into a laboratory XUV spectrometer and reflectometer. Our measurements compare the quantum efficiency of a state-of-the-art XUV array CCD to a phosphor-coated line sensor and a new backthinned line sensor. Additionally, we show recorded spectra from a laboratory DPP source to demonstrate the potential of a wide range of applications.

  18. Extreme ultraviolet observations from voyager 2 encounter with jupiter.

    PubMed

    Sandel, B R; Shemansky, D E; Broadfoot, A L; Bertaux, J L; Blamont, J E; Belton, M J; Ajello, J M; Holberg, J B; Atreya, S K; Donahue, T M; Moos, H W; Strobel, D F; McConnell, J C; Dalgarno, A; Goody, R; McElroy, M B; Takacs, P Z

    1979-11-23

    Extreme ultraviolet spectral observations of the Jovian planetary system made during the Voyager 2 encounter have extended our knowledge of many of the phenomena and physical processes discovered by the Voyager 1 ultraviolet spectrometer. In the 4 months between encounters, the radiation from Io's plasma torus has increased in intensity by a factor of about 2. This change was accompanied by a decrease in plasma temperature of about 30 percent. The high-latitude auroral zones have been positively associated with the magnetic projection of the plasma torus onto the planet. Emission in molecular hydrogen bands has been detected from the equatorial regions of Jupiter, indicating planetwide electron precipitation. Hydrogen Lyman alpha from the dark side of the planet has been measured at an intensity of about 1 kilorayleigh. An observation of the occultation of alpha Leonis by Jupiter was carried out successfully and the data are being analyzed in detail.

  19. Extreme ultraviolet lithography: A few more pieces of the puzzle

    SciTech Connect

    Anderson, Christopher N.

    2009-05-20

    The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this

  20. High numerical aperture projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2000-01-01

    An optical system is described that is compatible with extreme ultraviolet radiation and comprises five reflective elements for projecting a mask image onto a substrate. The five optical elements are characterized in order from object to image as concave, convex, concave, convex, and concave mirrors. The optical system is particularly suited for ring field, step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width which effectively minimizes dynamic distortion. The present invention allows for higher device density because the optical system has improved resolution that results from the high numerical aperture, which is at least 0.14.

  1. Extreme ultraviolet radiation emitted by helium microwave driven plasmas

    SciTech Connect

    Espinho, S.; Felizardo, E.; Tatarova, E. Alves, L. L.

    2016-06-28

    The extreme ultraviolet radiation emitted by helium microwave-driven (2.45 GHz) plasmas operating at low-pressure conditions was investigated. Novel data regarding emitted spectral lines of excited helium atoms and ions in the 20–33 nm wavelength range and their intensity behavior with variation of discharge operational conditions are presented. The intensity of all the spectral emissions was found to strongly increase with the microwave power delivered to the plasma. Furthermore, the intensity of the ionic spectral emissions decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar.

  2. Microchannel plate EUV detectors for the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Siegmund, O. H. W.; Malina, R. F.; Coburn, K.; Werthimer, D.

    1984-01-01

    The design and operating characteristics of the prototype imaging microchannel plate (MCP) detector for the Extreme Ultraviolet Explorer (EUVE) Satellite are discussed. It is shown that this detector has achieved high position resolution performance (greater than 512 x 512 pixels) and has low (less than one percent) image distortion. In addition, the channel plate scheme used has tight pulse height distributions (less than 40 percent FWHM) for UV radiation and displays low (less than 0.2 cnt/sq cm-s) dark background counting rates. Work that has been done on EUV filters in relation to the envisaged filter and photocathode complement is also described.

  3. Extreme-ultraviolet Bragg holographic structures: theory and experiments

    SciTech Connect

    Jannson, T.; Savant, G.; Wang, L. )

    1991-10-01

    A theoretical analysis of extreme-ultraviolet (XUV) Bragg (volume) holographic diffraction structures with arbitrary periodic spatial-modulation profiles is presented, and two basic approaches for the fabrication of XUV holographic optical elements suggested by the theory are discussed. The theoretical results are compared with preliminary experimental observations from XUV Bragg holographic structures recently fabricated in the laboratory, and fairly good agreement is found. This comparison indicates that our holographic materials can reach very high refractive-index modulation ({Delta}n{similar to}0.4) and are thus good candidates for the production of high-efficiency XUV holographic optical elements.

  4. Self-cleaning optic for extreme ultraviolet lithography

    DOEpatents

    Klebanoff, Leonard E.; Stulen, Richard H.

    2003-12-16

    A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O.sub.2, H.sub.2, H.sub.2 O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.

  5. A rocket measurement of the extreme ultraviolet dayglow

    NASA Technical Reports Server (NTRS)

    Christensen, A. B.

    1976-01-01

    Extreme ultraviolet spectra of the mid-latitude dayglow in the wavelength range of 550 to 1250A have been obtained with a rocket borne grating spectrometer at a resolution of 20A. Spectra were obtained in the altitude range of 140 to 280 km. The spectra are dominated by emissions from atomic multiplets and no molecular bands have been identified with certainty. The strongest emissions other than H Lyman-alpha are OI (989) and OII (834). Other prominent emissions include He I(584), N II(916) and N II(1085). An unexpected feature near 612A has an intensity comparable to He I(584).

  6. Characteristics of extreme ultraviolet emission from high-Z plasmas

    NASA Astrophysics Data System (ADS)

    Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

    2016-03-01

    We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

  7. Extreme ultraviolet emission spectra of Gd and Tb ions

    SciTech Connect

    Kilbane, D.; O'Sullivan, G.

    2010-11-15

    Theoretical extreme ultraviolet emission spectra of gadolinium and terbium ions calculated with the Cowan suite of codes and the flexible atomic code (FAC) relativistic code are presented. 4d-4f and 4p-4d transitions give rise to unresolved transition arrays in a range of ions. The effects of configuration interaction are investigated for transitions between singly excited configurations. Optimization of emission at 6.775 nm and 6.515 nm is achieved for Gd and Tb ions, respectively, by consideration of plasma effects. The resulting synthetic spectra are compared with experimental spectra recorded using the laser produced plasma technique.

  8. A rocket measurement of the extreme ultraviolet dayglow

    NASA Technical Reports Server (NTRS)

    Christensen, A. B.

    1976-01-01

    Extreme ultraviolet spectra of the mid-latitude dayglow in the wavelength range of 550 to 1250A have been obtained with a rocket borne grating spectrometer at a resolution of 20A. Spectra were obtained in the altitude range of 140 to 280 km. The spectra are dominated by emissions from atomic multiplets and no molecular bands have been identified with certainty. The strongest emissions other than H Lyman-alpha are OI (989) and OII (834). Other prominent emissions include He I(584), N II(916) and N II(1085). An unexpected feature near 612A has an intensity comparable to He I(584).

  9. ORFEUS - Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer

    NASA Astrophysics Data System (ADS)

    Rippel, H.; Kampf, D.; Graue, R.

    1991-06-01

    The Orbiting and Retrievable Far and Extreme Ultraviolet Spectrometer (ORFEUS) to be flown with the ASTRO-SPAS satellite is described. The ORFEUS instrument complex consists of a 10-m on-axis telescope with a focal length of 2426 mm, an Echelle spectrometer for the FUV region, and a Rowland spectrometer for the EUV region. The main objectives of the ORFEUS are spectroscopic measurements of cosmic radiation sources in the temperature region between 10 exp 4 K and 10 exp 6 K. The paper includes configuration diagrams of the ORFEUS and the ASTRO SPAS.

  10. In-line extreme ultraviolet polarizer with hybrid configuration.

    PubMed

    Yang, Minghong; Tong, Xinling; Sun, Yan; Jiang, Desheng; Zhou, Ciming; Zhang, Dongsheng

    2009-03-01

    A novel hybrid Au-multilayer-Au in-line extreme ultraviolet (EUV) optical polarizer is presented in this paper. Different from all-Mo/Si multilayer EUV polarizer, this polarizer is based on the concept that Au surfaces work as reflecting elements for in-line optics routine, while polarization effect is realized by polarizing multilayer. Simulation shows that the proposed polarizer with 80 degrees-70 degrees-80 degrees angle configuration has about 30% of transmission and 12 eV of bandwidth half maximum, which enables more throughput and broader bandwidth than the all-multilayer one.

  11. MoRu/Be multilayers for extreme ultraviolet applications

    DOEpatents

    Bajt, Sasa C.; Wall, Mark A.

    2001-01-01

    High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

  12. Interferometry in the Extreme Ultraviolet and X-Ray

    NASA Technical Reports Server (NTRS)

    Cash, W.; Shipley, A.; Osterman, S.; Joy, M. K.

    2000-01-01

    We report on demonstration of an x-ray interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and soft x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. Our system, by using two separate optical channels to create interference from two areas of the wavefront, has broad band response and much higher efficiency. We discuss some applications of this technique to astronomy and microscopy including the possibility of eventually capturing a micro-arcsecond image of a black hole.

  13. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    NASA Astrophysics Data System (ADS)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  14. Extreme ultraviolet spectroscopy of PKS 2155-304.

    PubMed

    Fruscione, A; Bowyer, S; Konigl, A; Kahn, S M

    1994-02-20

    We present the extreme ultraviolet (75-110 angstroms) spectrum of the BL Lac object PKS 2155-304, the first spectrum of an extragalactic source obtained with the Extreme Ultraviolet Explorer. The spectrum shows a generally smooth continuum, which can be modeled by a single power law plus interstellar absorption, and possibly an absorption feature at approximately 80 angstroms. The best fit to the data suggests that the EUV spectrum can be interpreted as a simple extrapolation of the X-ray continuum, with an energy index alpha approximately 1.6; however, shallower or steeper power laws with indices between -0.4 and 2.7 cannot be ruled out by the existing EUV data alone. The data provide strong constraints on the interstellar neutral H and He along the line of sight. Using a column density of 1.36 x 10(20) cm-2 for the Galactic neutral hydrogen along the PKS 2155-304 line of sight, the neutral helium column density is constrained to be 9%-10% of the hydrogen amount.

  15. Spectrophotometry of extreme helium stars - Ultraviolet fluxes and effective temperatures

    NASA Technical Reports Server (NTRS)

    Heber, U.; Drilling, J. S.; Schoenberner, D.; Lynas-Gray, A. E.

    1984-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broadband photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broadband photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K. Previously announced in STAR as N83-24433

  16. Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Erdmann, Andreas; Evanschitzky, Peter; Neumann, Jens Timo; Gräupner, Paul

    2016-04-01

    The mask plays a significant role as an active optical element in lithography, for both deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography. Mask-induced and feature-dependent shifts of the best-focus position and other aberration-like effects were reported both for DUV immersion and for EUV lithography. We employ rigorous computation of light diffraction from lithographic masks in combination with aerial image simulation to study the root causes of these effects and their dependencies from mask and optical system parameters. Special emphasis is put on the comparison of transmission masks for DUV lithography and reflective masks for EUV lithography, respectively. Several strategies to compensate the mask-induced phase effects are discussed.

  17. The Second Extreme Ultraviolet Explorer Right Angle Program Catalog

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Craig, N.; Cahill, W.; Roberts, B.; Malina, R. F.

    1999-05-01

    We present the detection of 235 extreme ultraviolet sources, of which 169 are new detections, using the Extreme Ultraviolet Explorer's (EUVE) Right Angle Program (RAP) data. This catalog includes observations since the first EUVE RAP catalog (1994 January) and covers 17% of the sky. The EUVE RAP uses the all-sky survey telescopes (also known as ``scanners''), mounted at right angles to the Deep Survey and spectrometer instruments, to obtain photometric data in four wavelength bands centered at ~100 Å (Lexan/B), ~200 Å (Al/Ti/C), ~400 Å (Ti/Sb/Al), and ~550 Å (Sn/SiO). This allows the RAP to accumulate data serendipitously during pointed spectroscopic observations. The long exposure times possible with RAP observations provide much greater sensitivity than the all-sky survey. We present EUVE source count rates and probable source identifications from the available catalogs and literature. The source distribution is similar to previous extreme ultraviolet (EUV) catalogs with 2% early-type stars, 45% late-type stars, 8% white dwarfs, 6% extragalactic, 24% with no firm classification, and 15% with no optical identification. We also present 36 detections of early-type stars that are probably the result of non-EUV radiation. We have detected stellar flares from approximately 12 sources, including: EUVE J0008+208, M4 star G32-6 (EUVE J0016+198), a new source EUVE J0202+105, EUVE J0213+368, RS CVn V711 Tau (EUVE J0336+005), BY Draconis type variable V837 Tau (EUVE J0336+259), the new K5 binary EUVE J0725-004, EUVE J1147+050, EUVE J1148-374, EUVE J1334-083 (EQ Vir), EUVE J1438-432 (WT 486/487), EUVE J1808+297, and the M5.5e star G208-45 (EUVE J1953+444). We present sample light curves for the brighter sources.

  18. Extreme- and far-ultraviolet environment at shuttle altitudes

    SciTech Connect

    Chakrabarti, S.

    1987-01-01

    The astronomical data obtained by the Far Ultraviolet Space Telescope (FAUST) and the Very Wide Field Camera (VWFC) on board the Spacelab I mission have triggered questions on the natural and induced Extreme and Far Ultraviolet (EUV and FUV) environment of the space shuttle. Moreover, the recent discovery of approx. lk Rayleighs N/sub 2/ Lyman Birge Hopfield (LBH) nightglow emissions by the U.S. Air Force's S3-4 satellite, and subsequent confirmation by the Imaging Spectrometric Observatory (ISO) experiment on the Spacelab I mission have serious implications for the astronomical observations from the shuttle. Since both ISO and S3-4 experiments were conducted from shuttle altitudes, the implied EUV and FUV environment for astronomical observations can be severe. In order to address the question of the suitability of the shuttle as an astronomical platform, data from FAUST and other experiments were examined. It is concluded that the FAUST background is most likely due to the observation of tropical UV arcs, a natural airglow phenomenon. Strategies for future shuttle experiments to overcome this and other natural emissions are discussed.

  19. Toward defect-free fabrication of extreme ultraviolet photomasks

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed H.; Lawliss, Mark; Badger, Karen D.; Turley, Christina

    2016-04-01

    Defect-free fabrication of extreme ultraviolet (EUV) masks relies on the appropriate detection of native defects and subsequent strategies for their elimination. Commercial unavailability of actinic mask-blank inspection systems motivates the identification of an optical inspection methodology most suitable for finding relevant EUV blank defects. Studies showed that 193-nm wavelength inspection found the greatest number of printable defects as compared with rival higher-wavelength systems, establishing deep ultraviolet inspections as the blank defectivity baseline for subsequent mitigation strategies. Next, defect avoidance via pattern shifting was explored using representative 7-nm node metal/contact layer designs and 193-nm mask-blank inspection results. It was found that a significant percentage of native defects could be avoided only when the design was limited to active patterns (i.e., layouts without dummy fill). Total pattern-defect overlap remained ≤5 when metal layer blanks were chosen from the top 35% least defective substrates, while the majority of blanks remained suitable for contacts layers due to a lower active pattern density. Finally, nanomachining was used to address remaining native/multilayer defects. Native catastrophic defects were shown to recover 40% to 70% of target critical dimension after nanomachining, demonstrating the enormous potential for compensating multilayer defects.

  20. Plans for the extreme ultraviolet explorer data base

    NASA Technical Reports Server (NTRS)

    Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

    1988-01-01

    The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

  1. The Extreme-ultraviolet Emission from Sun-grazing Comets

    NASA Technical Reports Server (NTRS)

    Bryans, Paul; Pesnell, William D.

    2012-01-01

    The Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory has observed two Sun-grazing comets as they passed through the solar atmosphere. Both passages resulted in a measurable enhancement of extreme-ultraviolet (EUV) radiance in several of the AIA bandpasses.We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Molecules in the comet rapidly sublimate as it approaches the Sun. They are then photodissociated by the solar radiation field to create atomic species. Subsequent ionization of these atoms produces a higher abundance of ions than normally present in the corona and results in EUV emission in the wavelength ranges of the AIA telescope passbands.

  2. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    PubMed Central

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-01-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam. PMID:27501749

  3. Absolute measurement of undulator radiation in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Maezawa, H.; Mitani, S.; Suzuki, Y.; Kanamori, H.; Tamamushi, S.; Mikuni, A.; Kitamura, H.; Sasaki, T.

    1983-04-01

    The spectral brightness of undulator radiation emitted by the model PMU-1 incorporated in the SOR-RING, the dedicated synchrotron radiation source in Tokyo, has been studied in the extreme ultraviolet region from 21.6 to 72.9 eV as a function of the electron energy γ, the field parameter K, and the angle of observation ϴ in the absolute scale. A series of measurements covering the first and the second harmonic component of undulator radiation was compared with the fundamental formula λ n= {λ 0}/{2nγ 2}( {1+K 2}/{2}+γϴ 2 and the effects of finite emittance were studied. The brightness at the first peak was smaller than the theoretical value, while an enhanced second harmonic component was observed.

  4. Direct spectrotemporal characterization of femtosecond extreme-ultraviolet pulses

    NASA Astrophysics Data System (ADS)

    Gauthier, David; Mahieu, Benoît; De Ninno, Giovanni

    2013-09-01

    We propose a method for straightforward characterization of the temporal shape of femtosecond pulses in the extreme-ultraviolet and soft x-ray spectral region. The approach is based on the presence of a significant linear frequency chirp in the pulse. This allows us to establish an homothetic relation between the pulse spectrum and its temporal profile. The theoretical approach is reminiscent of the one employed by Fraunhofer for describing far-field diffraction. As an application, we consider the case of a seeded free-electron laser (FEL). The theory is successfully benchmarked with numerical simulations and with experimental data collected on the FERMI@Elettra FEL. The proposed method provides FEL users with an online, shot-to-shot spectrotemporal diagnostic for time-resolved experiments.

  5. Extreme ultraviolet patterning of tin-oxo cages

    NASA Astrophysics Data System (ADS)

    Haitjema, Jarich; Zhang, Yu; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Brouwer, Albert M.

    2017-03-01

    We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages: molecular building blocks that are known to turn insoluble upon EUV exposure, thus having the properties of a negative tone photoresist. In this work, we focus on contrast curves of the materials using open-frame EUV exposures and their patterning capabilities using EUV interference lithography. It is shown that baking steps, such as post-exposure baking (PEB) can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. In addition, we show that the exchange of the anions of the cage can make a difference in terms of their physical properties. Our results demonstrate the significance of process optimization while evaluating the resist performance of novel molecular materials.

  6. Normal incidence multilayer mirrors for extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Stern, R. A.; Haisch, B. M.; Joki, E. G.; Catura, R. C.

    1984-01-01

    Sputtered multilayer coatings allow the use of normal incidence optics in the extreme ultraviolet (EUV) region below 500 A. Multilayer mirrors can be tailored to provide images at strong EUV lines in the sun and stars, in many cases making more efficient use of the telescope aperture than grazing incidence optics. Alternatively, the bandpass can be broadened at the expense of peak effective area, by varying the multilayer structure over the mirror surface. Such mirrors can also serve as optical elements in spectrographs for investigation of specific emission and absorption line complexes, and are self-filtering in that they reject nearby geocoronal and cosmic resonance line backgrounds. Current efforts at the Lockheed Palo Alto Research Laboratory in the design, fabrication, and testing of EUV multilayer mirrors are discussed. This program includes the design and fabrication of normal incidence EUV multilayer mirrors, and the deposition of multilayers on lacquer-coated substrates.

  7. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  8. Extreme ultraviolet observations from voyager 1 encounter with jupiter.

    PubMed

    Broadfoot, A L; Belton, M J; Takacs, P Z; Sandel, B R; Shemansky, D E; Holberg, J B; Ajello, J M; Atreya, S K; Donahue, T M; Moos, H W; Bertaux, J L; Blamont, J E; Strobel, D F; McConnell, J C; Dalgarno, A; Goody, R; McElroy, M B

    1979-06-01

    Observations of the optical extreme ultraviolet spectrum of the Jupiter planetary system during the Voyager 1 encounter have revealed previously undetected physical processes of significant proportions. Bright emission lines of S III, S IV, and O III indicating an electron temperature of 10(5) K have been identified in preliminary analyses of the Io plasma torus spectrum. Strong auroral atomic and molecular hydrogen emissions have been observed in the polar regions of Jupiter near magnetic field lines that map the torus into the atmosphere of Jupiter. The observed resonance scattering of solar hydrogen Lyman alpha by the atmosphere of Jupiter and the solar occultation experiment suggest a hot thermosphere (>/= 1000 K) wvith a large atomic hydrogen abundance. A stellar occultation by Ganymede indicates that its atmosphere is at most an exosphere.

  9. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT

    SciTech Connect

    Zhang, X. L.; Cheng, Z. F. Hou, S. Y.; Zhuang, G.; Luo, J.

    2014-11-15

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  10. Extreme ultraviolet spectra of highly ionized oxygen and fluorine

    NASA Technical Reports Server (NTRS)

    Pegg, D. J.; Griffin, P. M.; Haselton, H. H.; Laubert, R.; Mowat, J. R.; Thoe, R. S.; Peterson, R. S.; Sellin, I. A.

    1974-01-01

    The foil-excitation method has been used to study the extreme ultraviolet spectra of highly ionized oxygen and fluorine. Several previously unreported lines in heliumlike fluorine are reported and other newly reported lines in heliumlike oxygen have been measured to higher accuracy. Included in the measurements are certain heliumlike oxygen transitions of significance in interpretation of solar-flare spectral observations. The wavelength determinations are usually in good agreement with calculated results which includes relativistic corrections, but discrepancies arise when nonrelativistic calculations are used. A comparison of the present results and those recently obtained by theta-pinch and laser-induced plasma sources is made for both heliumlike and lithiumlike ions; a few discrepancies occur, with results in most cases in better agreement with relativistically corrected calculations. Certain unidentified lines in the spectra may be attributable to radiative transitions between quartet states of lithiumlike ions.

  11. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXT.

    PubMed

    Zhang, X L; Cheng, Z F; Hou, S Y; Zhuang, G; Luo, J

    2014-11-01

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  12. Beryllium based multilayers for normal incidence extreme ultraviolet reflectivity

    SciTech Connect

    Skulina, K.M.; Alford, C.; Bionta, R.M.; Makowiecki, D.M.; Kortright, J.; Soufli, R.; Gullikson, E.; Underwood, J.

    1994-05-26

    The need for normal incidence mirrors maintaining reflectivity greater than 60% for an industrially competitive Extreme Ultraviolet Lithography (EUV) system has been well documented. The Molybdenum/Silicon system has emerged as the de-facto standard, where researchers are now routinely fabricating mirrors demonstrating 63% reflectivity near 130 Angstroms. However, multilayer mirrors using beryllium as the low atomic number (low-Z) spacer could potentially show similar or better reflectivity, and operate at wavelengths down to the beryllium K-edge at 111 Angstroms. Besides offering potentially greater reflectivity, the shorter wavelength light offers increased dissolution depth in photoresists, and offers potentially better resolution and depth of focus. We will report our latest results from beryllium based multilayers. The mirrors were fabricated at the Lawrence Livermore National Laboratory (LLNL) and tested at the Center for X-Ray Optics at Lawrence Berkeley Laboratory (CXRO/LBL).

  13. Method for the protection of extreme ultraviolet lithography optics

    DOEpatents

    Grunow, Philip A.; Clift, Wayne M.; Klebanoff, Leonard E.

    2010-06-22

    A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 .ANG. thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH.sub.3 and H.sub.2S. The use of PH.sub.3 and H.sub.2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 .ANG. thick in a vacuum atmosphere such as found in an EUVL machine.

  14. Broadband extreme ultraviolet probing of transient gratings in vanadium dioxide

    DOE PAGES

    Sistrunk, Emily; Grilj, Jakob; Jeong, Jaewoo; ...

    2015-02-11

    Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). The study demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO2 film with EUV diffraction from the optically excited sample. The VO2 exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separate the twomore » features.« less

  15. Extreme ultraviolet induced defects on few-layer graphene

    SciTech Connect

    Gao, A.; Zoethout, E.; Lee, C. J.; Rizo, P. J.; Scaccabarozzi, L.; Banine, V.; Bijkerk, F.

    2013-07-28

    We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e., relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a H{sub 2} background increases the graphene dosage sensitivity, due to reactions caused by the EUV induced hydrogen plasma. X-ray photoelectron spectroscopy results show that the sp{sup 2} bonded carbon fraction decreases while the sp{sup 3} bonded carbon and oxide fraction increases with exposure dose. Our experimental results confirm that even in reducing environment oxidation is still one of the main source of inducing defects.

  16. A Penning discharge source for extreme ultraviolet calibration

    NASA Technical Reports Server (NTRS)

    Finley, David S.; Jelinsky, Patrick; Bowyer, Stuart; Malina, Roger F.

    1986-01-01

    A Penning discharge lamp for use in the calibration of instruments and components for the extreme ultraviolet has been developed. This source is sufficiently light and compact to make it suitable for mounting on the movable slit assembly of a grazing incidence Rowland circle monochromator. Because this is a continuous discharge source, it is suitable for use with photon counting detectors. Line radiation is provided both by the gas and by atoms sputtered off the interchangeable metal cathodes. Usable lines are produced by species as highly ionized as Ne IV and Al V. The wavelength coverage provided is such that a good density of emission lines is available down to wavelengths as short as 100A. This source fills the gap between 100 and 300A, which is inadequately covered by the other available compact continuous radiation sources.

  17. Broadband extreme ultraviolet probing of transient gratings in vanadium dioxide

    SciTech Connect

    Sistrunk, Emily; Grilj, Jakob; Jeong, Jaewoo; Samant, Mahesh G.; Gray, Alexander X.; Dürr, Hermann A.; Parkin, Stuart S. P.; Gühr, Markus

    2015-02-11

    Nonlinear spectroscopy in the extreme ultraviolet (EUV) and soft x-ray spectral range offers the opportunity for element selective probing of ultrafast dynamics using core-valence transitions (Mukamel et al., Acc. Chem. Res. 42, 553 (2009)). The study demonstrate a step on this path showing core-valence sensitivity in transient grating spectroscopy with EUV probing. We study the optically induced insulator-to-metal transition (IMT) of a VO2 film with EUV diffraction from the optically excited sample. The VO2 exhibits a change in the 3p-3d resonance of V accompanied by an acoustic response. Due to the broadband probing we are able to separate the two features.

  18. Extreme ultraviolet spectrograph ATM experiment S082B

    NASA Technical Reports Server (NTRS)

    Bartoe, J.-D. F.; Brueckner, G. E.; Purcell, J. D.; Tousey, R.

    1977-01-01

    The extreme-ultraviolet double-dispersion photographic spectrograph for the Apollo Telescope Mount (ATM) experiment S082B on Skylab is described. Novel features were the use of a predisperser grating with a ruling whose spacing varied approximately linearly with distance for the purpose of increasing the instrument speed by reducing the astigmatism and a photoelectric servosystem to stabilize to 1 sec of arc the solar image at various near-limb positions. The 970-3940-A range was covered in two sections with effective resolving power of approximately 30,000 from 1100 A to 1970 A. The spatial resolution was 2 x 60 solar sec of arc. During the Skylab mission 6400 exposures were made with the instrument pointed by an astronaut at selected and recorded solar positions.

  19. Extreme ultraviolet dayglow observations with a helium gas absorption cell

    NASA Technical Reports Server (NTRS)

    Freeman, J.; Paresce, F.; Bowyer, S.; Lampton, M.

    1978-01-01

    During the Apollo-Soyuz Test Project, an extreme-ultraviolet photometer with a cyclically operated helium gas-absorption cell observed the daytime sky from an orbital altitude of 225 km. When the line of sight pointed more than 60 deg from the sun, the instrument detected 2 to 70 rayleighs of flux scattered from neutral geocoronal helium at wavelengths from 504 to 584 A. The instrument also detected other radiation in the band 500-700 A of similar spatial distribution to the helium flux, which was definitely not due to the He I 584-A spectral line and which has not been detected by previous experimenters in data from 400 km altitude. Possible sources of this radiation are discussed.

  20. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength.

    PubMed

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-09

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  1. Upgrade of absolute extreme ultraviolet diagnostic on J-TEXTa)

    NASA Astrophysics Data System (ADS)

    Zhang, X. L.; Cheng, Z. F.; Hou, S. Y.; Zhuang, G.; Luo, J.

    2014-11-01

    The absolute extreme ultraviolet (AXUV) diagnostic system is used for radiation observation on J-TEXT tokamak [J. Zhang, G. Zhuang, Z. J. Wang, Y. H. Ding, X. Q. Zhang, and Y. J. Tang, Rev. Sci. Instrum. 81, 073509 (2010)]. The upgrade of the AXUV system is aimed to improve the spatial resolution and provide a three-dimensional image on J-TEXT. The new system consists of 12 AXUV arrays (4 AXUV16ELG arrays, 8 AXUV20ELG arrays). The spatial resolution in the cross-section is 21 mm for the AXUV16ELG arrays and 17 mm for the AXUV20ELG arrays. The pre-amplifier is also upgraded for a higher signal to noise ratio. By upgrading the AXUV imaging system, a more accurate observation on the radiation information is obtained.

  2. Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength

    NASA Astrophysics Data System (ADS)

    Fan, Daniel; Wang, Li; Ekinci, Yasin

    2016-08-01

    Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach for their formation is to use circularly symmetric diffraction gratings. Such a ring grating was designed and fabricated for the extreme ultraviolet (EUV) wavelength of 13.5 nm, a candidate wavelength for future industrial lithography. Exposure of the aerial images showed that a Bessel beam with an approximately 1 mm long z-invariant central core of 223 nm diameter had been achieved, in good agreement with theory. Arbitrary patterns were written using the Bessel spot, demonstrating possible future application of Bessel beams for serial beam writing. Lithographic marks of ~30 nm size were also observed using a high resolution Bessel beam.

  3. At-wavelength interferometry of extreme ultraviolet lithographic optics

    NASA Astrophysics Data System (ADS)

    Lee, Sang Hun; Naulleau, Patrick; Goldberg, Kenneth; Tejnil, Edita; Medecki, Hector; Bresloff, Cynthia; Chang, Chang; Attwood, David; Bokor, Jeffrey

    1998-11-01

    A phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to evaluate optics for extreme ultraviolet (EUV) projection lithography systems. The interferometer has been implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory and is currently being used to test experimental EUV Schwarzschild objectives. Recent PS/PDI measurements indicate these experimental objectives to have wavefront errors on the order of 0.1 waves (˜1 nm at a wavelength of 13.4 nm) rms. These at-wavelength measurements have also revealed the multilayer phase effects, demonstrating the sensitivity and importance of EUV characterization. The measurement precision of the PS/PDI has been experimentally determined to be better than 0.01 waves. Furthermore, a systematic-error-limited absolute measurement accuracy of 0.004 waves has been demonstrated.

  4. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    SciTech Connect

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. In this article, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s-1 is generated at 22.3 eV, with 5 × 10-5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Finally, spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  5. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV.

    PubMed

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S; Ranitovic, Predrag; Kaindl, Robert A

    2015-06-11

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. Here, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 10(13) s(-1) is generated at 22.3 eV, with 5 × 10(-5) conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications.

  6. Bright high-repetition-rate source of narrowband extreme-ultraviolet harmonics beyond 22 eV

    PubMed Central

    Wang, He; Xu, Yiming; Ulonska, Stefan; Robinson, Joseph S.; Ranitovic, Predrag; Kaindl, Robert A.

    2015-01-01

    Novel table-top sources of extreme-ultraviolet light based on high-harmonic generation yield unique insight into the fundamental properties of molecules, nanomaterials or correlated solids, and enable advanced applications in imaging or metrology. Extending high-harmonic generation to high repetition rates portends great experimental benefits, yet efficient extreme-ultraviolet conversion of correspondingly weak driving pulses is challenging. Here, we demonstrate a highly-efficient source of femtosecond extreme-ultraviolet pulses at 50-kHz repetition rate, utilizing the ultraviolet second-harmonic focused tightly into Kr gas. In this cascaded scheme, a photon flux beyond ≈3 × 1013 s−1 is generated at 22.3 eV, with 5 × 10−5 conversion efficiency that surpasses similar harmonics directly driven by the fundamental by two orders-of-magnitude. The enhancement arises from both wavelength scaling of the atomic dipole and improved spatio-temporal phase matching, confirmed by simulations. Spectral isolation of a single 72-meV-wide harmonic renders this bright, 50-kHz extreme-ultraviolet source a powerful tool for ultrafast photoemission, nanoscale imaging and other applications. PMID:26067922

  7. A comparison between measured surface microtopography and observed scattering in the extreme ultraviolet

    NASA Technical Reports Server (NTRS)

    Green, James; Jelinsky, Sharon; Bowyer, Stuart; Malina, Roger F.

    1988-01-01

    The paper presents comparative measurements of surface roughness on prepared samples. These measurements have been made with both Talystep profilometers and WYKO interferometers. In addition, the scattering distribution from these samples was measured at extreme ultraviolet wavelengths. The utility of the WYKO interferometer and Talystep device for specifying extreme ultraviolet mirror surface quality is discussed.

  8. An operations and command systems for the extreme ultraviolet explorer

    NASA Technical Reports Server (NTRS)

    Muscettola, Nicola; Korsmeyer, David J.; Olson, Eric C.; Wong, Gary

    1994-01-01

    About 40% of the budget of a scientific spacecraft mission is usually consumed by Mission Operations & Data Analysis (MO&DA) with MO driving these costs. In the current practice, MO is separated from spacecraft design and comes in focus relatively late in the mission life cycle. As a result, spacecraft may be designed that are very difficult to operate. NASA centers have extensive MO expertise but often lessons learned in one mission are not exploited for other parallel or future missions. A significant reduction of MO costs is essential to ensure a continuing and growing access to space for the scientific community. We are addressing some of these issues with a highly automated payload operations and command system for an existing mission, the Extreme Ultraviolet Explorer (EUVE). EUVE is currently operated jointly by the Goddard Space Flight Center (GSFC), responsible for spacecraft operations, and the Center for Extreme Ultraviolet Astrophysics (CEA) of the University of California, Berkeley, which controls the telescopes and scientific instruments aboard the satellite. The new automated system is being developed by a team including personnel from the NASA Ames Research Center (ARC), the Jet Propulsion Laboratory (JPL) and the Center for EUV Astrophysics (CEA). An important goal of the project is to provide AI-based technology that can be easily operated by nonspecialists in AI. Another important goal is the reusability of the techniques for other missions. Models of the EUVE spacecraft need to be built both for planning/scheduling and for monitoring. In both cases, our modeling tools allow the assembly of a spacecraft model from separate sub-models of the various spacecraft subsystems. These sub-models are reusable; therefore, building mission operations systems for another small satellite mission will require choosing pre-existing modules, reparametrizing them with respect to the actual satellite telemetry information, and reassembling them in a new model. We

  9. Lamp for generating high power ultraviolet radiation

    DOEpatents

    Morgan, Gary L.; Potter, James M.

    2001-01-01

    The apparatus is a gas filled ultraviolet generating lamp for use as a liquid purifier. The lamp is powred by high voltage AC, but has no metallic electrodes within or in contact with the gas enclosure which is constructed as two concentric quartz cylinders sealed together at their ends with the gas fill between the cylinders. Cooling liquid is pumped through the volume inside the inner quartz cylinder where an electrically conductive pipe spaced from the inner cylinder is used to supply the cooling liquid and act as the high voltage electrode. The gas enclosure is enclosed within but spaced from a metal housing which is connected to operate as the ground electrode of the circuit and through which the treated fluid flows. Thus, the electrical circuit is from the central pipe, and through the cooling liquid, the gas enclosure, the treated liquid on the outside of the outer quartz cylinder, and to the housing. The high voltage electrode is electrically isolated from the source of cooling liquid by a length of insulated hose which also supplies the cooling liquid.

  10. Extreme-Ultraviolet Spectroscopy of Nearby B-Stars: Testing Models of Cosmic Reionization

    NASA Astrophysics Data System (ADS)

    Green, James

    This is a four-year sounding rocket investigation focusing on the extreme-ultraviolet (EUV; 500 – 1150 Å) spectrophotometry of nearby B-stars. Our observations will not only provide powerful constraints on stellar atmosphere models, but also provide key insights towards understanding the reionization of the early universe. The critical region from 700 – 900 Å, where the ionization cross section for neutral hydrogen is at its greatest, has never been observed for any B stars , nor is there any planned instrumentation to cover this waveband. Therefore, a sub-orbital mission is the ideal program to accomplish this science. We will develop a sounding rocket payload called DEUCE – the Dual-channel Extreme Ultraviolet Continuum Experiment. The proposed program addresses NASA’s strategic goals by: A) making unique observations relevant to the physics of re-ionization; B)demonstrating the space worthiness of a new class of ultraviolet detectors, and C)training the next generation of NASA space-mission scientists and PIs

  11. Properites of ultrathin films appropriate for optics capping layers in extreme ultraviolet lithography (EUVL)

    SciTech Connect

    Bajt, S; Edwards, N V; Madey, T E

    2007-06-25

    The contamination of optical surfaces by irradiation shortens optics lifetime and is one of the main concerns for optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools. This paper focuses on properties and surface chemistry of different materials, which as thin layers, could be used as capping layers to protect and extend EUVL optics lifetime. The most promising candidates include single element materials such as ruthenium and rhodium, and oxides such as TiO{sub 2} and ZrO{sub 2}.

  12. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Huang, Jianping; Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo

    2016-07-01

    Following the extreme solar minimum during 2008-2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, using observations from Earth-orbiting satellites, we compare the solar extreme ultraviolet (EUV) irradiance between SC23 and SC24 and investigate the solar cycle change of linear dependence of EUV on the P ((F10.7 + F10.7A)/2) and Mg II core-to-wing ratio indices. The Bremen composite Mg II index is strongly correlated with P over the two solar cycles, while this is not the case for the Laboratory for Atmospheric and Space Physics (LASP) composite Mg II index, so we focus on the different dependence of EUV on the P and LASP Mg II indices. As a result we find that three coronal emissions (Fe XV at 28.4 nm and 41.7 nm and Fe XVI at 33.5 nm) brighten in SC24 relative to P; i.e., the magnitude of irradiance is higher than in SC23 at the same level of P. But relative to the LASP Mg II index, these emissions show no appreciable solar cycle differences. By contrast, the H I Lyman α at 121.6 nm dims in SC24 relative to the LASP Mg II but shows identical dependence on P in the two solar cycles. This result seems to contradict a well-accepted fact that chromospheric and transition region emissions are better represented by the Mg II index and coronal lines by F10.7. For the different solar cycle variability of EUV in SC24, whether it is caused by source changes on the Sun is still unclear, but we suggest that it needs to be considered in proxy modeling of the EUV irradiance and aeronomic studies.

  13. Kr photoionized plasma induced by intense extreme ultraviolet pulses

    SciTech Connect

    Bartnik, A. Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

    2016-04-15

    Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

  14. Low extreme-ultraviolet luminosities impinging on protoplanetary disks

    SciTech Connect

    Pascucci, I.; Hendler, N. P.; Ricci, L.; Gorti, U.; Hollenbach, D.; Brooks, K. J.; Contreras, Y.

    2014-11-01

    The amount of high-energy stellar radiation reaching the surface of protoplanetary disks is essential to determine their chemistry and physical evolution. Here, we use millimetric and centimetric radio data to constrain the extreme-ultraviolet (EUV) luminosity impinging on 14 disks around young (∼2-10 Myr) sun-like stars. For each object we identify the long-wavelength emission in excess to the dust thermal emission, attribute that to free-free disk emission, and thereby compute an upper limit to the EUV reaching the disk. We find upper limits lower than 10{sup 42} photons s{sup –1} for all sources without jets and lower than 5 × 10{sup 40} photons s{sup –1} for the three older sources in our sample. These latter values are low for EUV-driven photoevaporation alone to clear out protoplanetary material in the timescale inferred by observations. In addition, our EUV upper limits are too low to reproduce the [Ne II] 12.81 μm luminosities from three disks with slow [Ne II]-detected winds. This indicates that the [Ne II] line in these sources primarily traces a mostly neutral wind where Ne is ionized by 1 keV X-ray photons, implying higher photoevaporative mass loss rates than those predicted by EUV-driven models alone. In summary, our results suggest that high-energy stellar photons other than EUV may dominate the dispersal of protoplanetary disks around sun-like stars.

  15. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  16. Extreme and far ultraviolet astronomy from Voyagers 1 and 2

    NASA Technical Reports Server (NTRS)

    Holberg, J. B.

    1990-01-01

    The instrumental characteristics, observational capabilities and scientific results of the Voyager 1 and 2 ultraviolet spectrometers are reviewed. These instruments provide current and ongoing access to low resolution spectra for a wide variety of astronomical sources in the 500 to 1700 A band. Observations of the brightest OB stars and hot subluminous stars as faint as V = 15 mag, are possible. In the EUV, at wavelengths shortward of 900 A, several new sources have been detected and a host of potential sources ruled out. In the far UV, particularly at wavelengths between 900 and 1200 A, Voyager is capable of observing a wide range of stellar and non-stellar sources. Such observations can often provide a valuable complement to IUE and other data sets at longer wavelengths. The Voyager spectrometers have proved remarkably stable photon counting instruments, capable of extremely long integration times. The long integration times, relatively large field of view, and location in the outer solar system also provide an ideal platform for observations of sources of faint diffuse emission, such as nebulae and the general sky background.

  17. Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

    NASA Astrophysics Data System (ADS)

    Passarelli, James; Murphy, Michael; Re, Ryan Del; Sortland, Miriam; Hotalen, Jodi; Dousharm, Levi; Fallica, Roberto; Ekinci, Yasin; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    We have developed organometallic carboxylate compounds [RnM)] capable of acting as negative-tone extreme ultraviolet (EUV) resists. The most sensitive of these resists contain antimony, three R-groups and two carboxylate groups, and carboxylate groups with polymerizable olefins (e.g., acrylate, methacrylate, or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of the molecules of the type RnM) where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR‧). The sensitivity of these resists was evaluated using Emax or dose to maximum resist thickness after exposure and development. We found that the greatest predictor of sensitivity of the RnSb) resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins versus the number of nonhydrogen atoms. Linear and log plots of Emax versus POL for a variety of molecules of the type R3Sb) lend insight into the behavior of these resists.

  18. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    NASA Technical Reports Server (NTRS)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  19. Imaging characteristics of the Extreme Ultraviolet Explorer microchannel plate detectors

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Kaplan, G. C.; Siegmund, O. H. W.; Lampton, M.; Malina, R. F.

    1989-01-01

    The Extreme Ultraviolet Explorer (EUVE) satellite will conduct an all-sky survey over the wavelength range from 70 A to 760 A using four grazing-incidence telescopes and seven microchannel-plate (MCP) detectors. The imaging photon-counting MCP detectors have active areas of 19.6 cm2. Photon arrival position is determined using a wedge-and-strip anode and associated pulse-encoding electronics. The imaging characteristics of the EUVE flight detectors are presented including image distortion, flat-field response, and spatial differential nonlinearity. Also included is a detailed discussion of image distortions due to the detector mechanical assembly, the wedge-and-strip anode, and the electronics. Model predictions of these distortions are compared to preflight calibration images which show distortions less than 1.3 percent rms of the detector diameter of 50 mm before correction. The plans for correcting these residual detector image distortions to less than 0.1 percent rms are also presented.

  20. Pattern inspection of etched multilayer extreme ultraviolet mask

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro

    2016-04-01

    Patterned mask inspection for an etched multilayer (ML) extreme ultraviolet mask was investigated. In order to optimize the mask structure from the standpoint of a pattern inspection the mask structure not only from the standpoint of a pattern inspection by using a projection electron microscope but also by using a projection electron microscope but also by considering the other fabrication processes using electron beam techniques such as critical dimension metrology and mask repair, we employed a conductive layer between the ML and substrate. By measuring the secondary electron emission coefficients of the candidate materials for the conductive layer, we evaluated the image contrast and the influence of the charging effect. In the cases of 40-pair ML, 16-nm-sized extrusion and intrusion defects were found to be detectable more than 10 sigma in half pitch 44, 40, and 32 nm line-and-space patterns. Reducing 40-pair ML to 20-pair ML degraded the image contrast and the defect detectability. However, by selecting B4C as a conductive layer, 16-nm-sized defects and etching residues remained detectable. The 16-nm-sized defects were also detected after the etched part was refilled with Si. A double-layer structure with 2.5-nm-thick B4C on metal film used as a conductive layer was found to have sufficient conductivity and also was found to be free from the surface charging effect and influence of native oxide.

  1. A small-scale extreme ultraviolet wave observed by SDO

    NASA Astrophysics Data System (ADS)

    Zheng, R.; Jiang, Y.; Hong, J.; Yang, J.; Bi, Y.; Yang, L.; Yang, D.

    2012-06-01

    "Extreme Ultraviolet (EUV) waves" are large-scale wavelike transients often associated with coronal mass ejections (CMEs). In this Letter, we present a possible detection of a fast-mode EUV wave associated with a mini-CME observed by the Solar Dynamics Observatory. On 2010 December 1, a small-scale EUV wave erupted near the disk center associated with a mini-CME, which showed all the low corona manifestations of a typical CME. The CME was triggered by the eruption of a mini-filament, with a typical length of about 30''. Although the eruption was tiny, the wave had the appearance of an almost semicircular front and propagated at a uniform velocity of 220-250km s-1 with very little angular dependence. The CME lateral expansion was asymmetric with an inclination toward north, and the southern footprints of the CME loops hardly shifted. The lateral expansion resulted in deep long-duration dimmings, showing the CME extent. Our analysis confirms that the small-scale EUV wave is a true wave, interpreted as the fast-mode wave.

  2. Multilayer coatings for optics in the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Larruquert, Juan I.; Vidal-Dasilva, Manuela; García-Cortés, Sergio; Rodríguez-de Marcos, Luis; Fernández-Perea, Mónica; Aznárez, José A.; Méndez, José A.

    2011-02-01

    The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of efficient coatings. The development of novel coatings with improved EUV performance is presented. An extensive research was performed on the search and characterization of new materials with low absorption or high reflectance. Lanthanide series was found to be a source of materials with relatively low absorption in this range, where most materials in nature present a strong absorption. Other materials, such as SiO and B, have been found to have interesting properties for applications on EUV coatings. As a result, novel multilayers based on Yb, Al, and SiO have been developed with narrowband performance in the 50-92 nm range. In some cases, the difficulty of developing narrowband coatings in the EUV can be overcome by designing multilayers that address specific purposes, such as maximizing and/or minimizing the reflectance at two or more wavelengths or bands. In this direction, we are working towards the development of coatings that combine a relatively high reflectance in a desired EUV band with a low reflectance in another band, for applications in which the presence of the latter radiation may mask a weak EUV radiation source.

  3. Four-mirror extreme ultraviolet (EUV) lithography projection system

    DOEpatents

    Cohen, Simon J; Jeong, Hwan J; Shafer, David R

    2000-01-01

    The invention is directed to a four-mirror catoptric projection system for extreme ultraviolet (EUV) lithography to transfer a pattern from a reflective reticle to a wafer substrate. In order along the light path followed by light from the reticle to the wafer substrate, the system includes a dominantly hyperbolic convex mirror, a dominantly elliptical concave mirror, spherical convex mirror, and spherical concave mirror. The reticle and wafer substrate are positioned along the system's optical axis on opposite sides of the mirrors. The hyperbolic and elliptical mirrors are positioned on the same side of the system's optical axis as the reticle, and are relatively large in diameter as they are positioned on the high magnification side of the system. The hyperbolic and elliptical mirrors are relatively far off the optical axis and hence they have significant aspherical components in their curvatures. The convex spherical mirror is positioned on the optical axis, and has a substantially or perfectly spherical shape. The spherical concave mirror is positioned substantially on the opposite side of the optical axis from the hyperbolic and elliptical mirrors. Because it is positioned off-axis to a degree, the spherical concave mirror has some asphericity to counter aberrations. The spherical concave mirror forms a relatively large, uniform field on the wafer substrate. The mirrors can be tilted or decentered slightly to achieve further increase in the field size.

  4. Ablation of Submicrometer Holes Using an Extreme-Ultraviolet Laser

    NASA Astrophysics Data System (ADS)

    Rossall, Andrew K.; Aslanyan, Valentin; Tallents, Greg J.; Kuznetsov, Ilya; Rocca, Jorge J.; Menoni, Carmen S.

    2015-06-01

    Simulations and experiments are used to study extreme-ultraviolet (EUV) laser drilling of submicrometer holes. The ablation process is studied with a 2D Eulerian hydrodynamic code that includes bound-free absorption processes relevant to the interaction of EUV lasers with a solid material. Good agreement is observed between the simulated and measured ablated depths for on-target irradiances of up to 1×10 10 W cm-2 . An increase in the irradiance to 1×10 12 W cm-2 is predicted to ablate material to a depth of 3.8 μ m from a single pulse with a hole diameter 3 to 4 times larger than the focal spot size. The model allows for the simulation of the interaction of a laser pulse with the crater created by a previous shot. Multiple-pulse lower-fluence irradiation configurations under optimized focusing conditions, i.e., approaching the diffraction limit, are shown to be advantageous for applications requiring mesoscale [(100 nm )- (1 μ m ) ] features and a high level of control over the ablation profile.

  5. Extreme Ultraviolet Explorer Right Angle Program observations of cool stars

    NASA Astrophysics Data System (ADS)

    Christian, D. J.; Drake, J. J.; Mathioudakis, M.

    1998-01-01

    The Extreme Ultraviolet Explorer (EUVE) Right Angle Program (RAP) obtains photometric data in four bands centered at 100 (Lexan/B), 200 (Al/Ti/C), 400 (Ti/Sb/Al), and 550 (Sn/SiO) during pointed spectroscopic observations. RAP observations are up to 20 times more sensitive than those in the EUVE all-sky survey. We present RAP observations of two dozen late-type stars. We derive surface fluxes from the Lexan/B and Al/Ti/C count rates and cataloged ROSAT Position Sensitive Proportional Counter (PSPC) data. The EUVE surface fluxes are reasonably correlated with surface fluxes calculated from PSPC measurements. The time variability of the sources has been examined. Most of the sources show no significant variability at the 99 percent confidence level. Flares were detected from the K7 V star Melotte 25 VA 334, the K3 V star V834 Tau (HD 29697), and the K3 + K8 Hyades binary BD +22669. The BD +22669 count rate at the peak of the flare is a factor of 6 higher than the quiescent count rate, with a peak Lexan/B luminosity of 7.9 1029 ergs/s. The V834 Tau flare was detected in both Lexan/B and Al/Ti/C bands. The peak luminosity of the flare is 1.6 1029 and 8 1028 ergs/s for Lexan/B and Al/Ti/C, respectively.

  6. An imaging extreme ultraviolet spectrometer for astrophysical investigations in space

    NASA Technical Reports Server (NTRS)

    Huber, M. C. E.; Timothy, J. G.; Morgan, J. S.; Lemaitre, G.; Tondello, G.

    1986-01-01

    A high-efficiency, extreme ultraviolet (EUV) imaging spectrometer has been constructed and tested. The spectrometer employs a concave toroidal grating illuminated at normal incidence in a Rowland circle mounting and has only one reflecting surface. The toroidal grating has been fabricated by a new technique employing an elastically deformable submaster grating which is replicated in a spherical form and then mechanically distorted to produce the desired aspect ratio of the toroidal surface for stigmatic imaging over the selected wavelength range. The fixed toroidal grating used in the spectrometer is then replicated from this surface. Photographic tests and initial photoelectric tests with a two-dimensional, pulse-counting detector system have verified the image quality of the toroidal grating at wavelengths near 600 A. The basic designs of two instruments employing the spectrometer for astrophysical investigations in space are described, namely, a high-resolution EUV spectroheliometer for studies of the solar chromosphere, transition region, and corona; and an EUV spectroscopic telescope for studies of nonsolar objects.

  7. Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors.

    PubMed

    Medvedev, V V; van den Boogaard, A J R; van der Meer, R; Yakshin, A E; Louis, E; Krivtsun, V M; Bijkerk, F

    2013-07-15

    We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due to the grating phase-shift resonance. The test structures, designed to suppress infrared (IR) radiation, were fabricated by masked deposition of a Si grating substrate followed by coating of the grating with a Mo/Si multilayer. To give the proof of principle, we developed such a hybrid mirror for the specific case of reflecting 13.5 nm radiation while suppressing 10 μm light, resulting in 61% reflectance at the wavelength of 13.5 nm together with the 70 × suppression rate of the specular reflection at the wavelength of 10 μm, but the considered filtering principle can be used for a variety of applications that are based on utilization of broadband radiation sources.

  8. Extreme ultraviolet spectroscopy of low pressure helium microwave driven discharges

    NASA Astrophysics Data System (ADS)

    Espinho, Susana; Felizardo, Edgar; Tatarova, Elena; Alves, Luis Lemos

    2016-09-01

    Surface wave driven discharges are reliable plasma sources that can produce high levels of vacuum and extreme ultraviolet radiation (VUV and EUV). The richness of the emission spectrum makes this type of discharge a possible alternative source in EUV/VUV radiation assisted applications. However, due to challenging experimental requirements, publications concerning EUV radiation emitted by microwave plasmas are scarce and a deeper understanding of the main mechanisms governing the emission of radiation in this spectral range is required. To this end, the EUV radiation emitted by helium microwave driven plasmas operating at 2.45 GHz has been studied for low pressure conditions. Spectral lines from excited helium atoms and ions were detected via emission spectroscopy in the EUV/VUV regions. Novel data concerning the spectral lines observed in the 23 - 33 nm wavelength range and their intensity behaviour with variation of the discharge operational conditions are presented. The intensity of all the spectral emissions strongly increases with the microwave power delivered to the plasma up to 400 W. Furthermore, the intensity of all the ion spectral emissions in the EUV range decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar. Work funded by FCT - Fundacao para a Ciencia e a Tecnologia, under Project UID/FIS/50010/2013 and grant SFRH/BD/52412/2013 (PD-F APPLAuSE).

  9. Contamination control approach for the Extreme Ultraviolet Explorer satellite instrumentation

    NASA Technical Reports Server (NTRS)

    Mrowka, Stan; Jelinsky, Sharon; Jelinsky, Patrick; Malina, Roger F.

    1987-01-01

    The Extreme Ultraviolet Explorer will perform an all-sky survey and spectroscopic observations over the wavelength range 80-900A. Hydrocarbon and particulate contamination will potentially affect the throughput and signal to noise ratio of the signal detected by the instruments. A witness sample program is here used to investigate and monitor the effects of specific contaminants on EUV reflectivity. Witness samples were intentionally contaminated with thin layers of pump oil. An oil layer 150 A thick was applied and found to evaporate over 8 hours. The EUV reflectivity and imaging properties were then measured and found to be acceptable for grazing angles between 5 and 30 deg. In a second test, layers 500 A thick were deposited and then allowed to evaporate in vacuum; once the oil had evaporated to at least 350 A, the final sample reflectivity was degraded less than 10 percent, but the image was degraded severely by scattering. An outline of the contamination control program is also presented.

  10. Smoothing of Diamond-Turned Substrates for Extreme Ultraviolet Illuminators

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Robinson, J C; Baker, S L; Ratti, S; Johnson, M A; Gullikson, E M

    2003-11-13

    Condenser optics in extreme ultraviolet lithography (EUVL) systems are subjected to frequent replacement as they are positioned close to the illumination source, where increased heating and contamination occur. In the case of aspherical condenser elements made by optical figuring/finishing, their replacement can be very expensive (several hundred thousand dollars). One approach to this problem would be to manufacture inexpensive illuminator optics that meet all required specifications and could be replaced at no substantial cost. Diamond-turned metal substrates are a factor of 100 less expensive than conventional aspherical substrates but have insufficient finish, leading to unacceptably low EUV reflectance after multilayer coating. In this work it is shown that, by applying a smoothing film prior to multilayer coating, the high spatial frequency roughness of a diamond-turned metal substrate is reduced from 1.76 to 0.27 nm rms while the figure slope error is maintained at acceptable levels. Metrology tests performed at various stages of the fabrication of the element demonstrated that it satisfied all critical figure and finish specifications as illuminator. Initial experimental results on the stability and performance of the optic under a real EUVL plasma source environment show no accelerated degradation when compared to conventional substrates.

  11. Tunable orbital angular momentum beams in the extreme ultraviolet/soft x-ray regimes

    NASA Astrophysics Data System (ADS)

    Turpin, Alex; Rego, Laura; San Román, Julio; Picón, Antonio; Plaja, Luis; Hernández-García, Carlos

    2017-05-01

    High-order harmonic generation (HHG) has been recently proven to produce harmonic vortices carrying orbital angular momentum (OAM) in the extreme-ultraviolet (XUV) region from the nonlinear up-conversion of infrared vortex beams. In this work we present two methods to control and extend the OAM content of the harmonic vortices. First, we show that when a driver combination of different vortex modes is used, HHG leads to the production of harmonic vortices with a broad OAM content due to its nonperturbative nature. Second, we show that harmonic vortices with two discrete OAM contributions -so called fractional OAM modes- are generated when HHG is driven by conical refraction beams. Our work offers the possibility of generating tunable OAM beams in the XUV regime, potentially extensible to the soft x rays, overcoming the state of the art limitations for the generation of OAM beams far from the visible domain.

  12. Extreme ultraviolet (EUV) and FUV calibration facility for special sensor ultraviolet limb imager (SSULI)

    NASA Astrophysics Data System (ADS)

    Boyer, Craig N.; Osterman, Steven N.; Thonnard, Stefan E.; McCoy, Robert P.; Williams, J. Z.; Parker, S. E.

    1994-09-01

    A facility for calibrating far ultraviolet and extreme ultraviolet instruments has recently been completed at the Naval Research Laboratory. Our vacuum calibration vessel is 2-m in length, 1.67-m in diameter, and can accommodate optical test benches up to 1.2-m wide by 1.5-m in length. A kinematically positioned frame with four axis precision pointing capability of 10 microns for linear translation and .01 degrees for rotation is presently used during vacuum optical calibration of SSULI. The chamber was fabricated from 304 stainless steel and polished internally to reduce surface outgassing. A dust-free environment is maintained at the rear of the vacuum chamber by enclosing the 2-m hinged vacuum access door in an 8 ft. by 8 ft. class 100 clean room. Every effort was made to obtain an oil-free environment within the vacuum vessel. Outgassing products are continually monitored with a 1 - 200 amu residual gas analyzer. An oil-free claw and vane pump evacuates the chamber to 10-2 torr through 4 in. diameter stainless steel roughing lines. High vacuum is achieved and maintained with a magnetically levitated 480 l/s turbo pump and a 3000 l/s He4 cryopump. Either of two vacuum monochrometers, a 1-m f/10.4 or a 0.2-m f/4.5 are coaxially aligned with the optical axis of the chamber and are used to select single UV atomic resonance lines from a windowless capillary or penning discharge UV light source. A calibrated channeltron detector is coaxially mounted with the SSULI detector during calibration. All vacuum valves, the cooling system for the cryopump compressor, and the roughing pump are controlled through optical fibers which are interfaced to a computer through a VME board. Optical fibers were chosen to ensure that complete electrical isolation is maintained between the computer and the vacuum system valves-solenoids and relays.

  13. Extreme ultraviolet spectra of solar flares from the extreme ultraviolet spectroheliograph SPIRIT onboard the CORONAS-F satellite

    SciTech Connect

    Shestov, S.; Kuzin, S.; Reva, A.

    2014-01-01

    We present detailed extreme ultraviolet (EUV) spectra of four large solar flares: M5.6, X1.3, X3.4, and X17 classes in the spectral ranges 176-207 Å and 280-330 Å. These spectra were obtained by the slitless spectroheliograph SPIRIT onboard the CORONAS-F satellite. To our knowledge, these are the first detailed EUV spectra of large flares obtained with a spectral resolution of ∼0.1 Å. We performed a comprehensive analysis of the obtained spectra and provide identification of the observed spectral lines. The identification was performed based on the calculation of synthetic spectra (the CHIANTI database was used), with simultaneous calculations of the differential emission measure (DEM) and density of the emitting plasma. More than 50 intense lines are present in the spectra that correspond to a temperature range of T = 0.5-16 MK; most of the lines belong to Fe, Ni, Ca, Mg, and Si ions. In all the considered flares, intense hot lines from Ca XVII, Ca XVIII, Fe XX, Fe XXII, and Fe XXIV are observed. The calculated DEMs have a peak at T ∼ 10 MK. The densities were determined using Fe XI-Fe XIII lines and averaged 6.5 × 10{sup 9} cm{sup –3}. We also discuss the identification, accuracy, and major discrepancies of the spectral line intensity prediction.

  14. Spectral catalogue of the intermediate ionization states of iron in the extreme ultraviolet

    SciTech Connect

    Beiersdorfer, P.; Utter, S.B.; Brown, G.V.

    1998-05-13

    Using precisely controlled laboratory conditions we have begun to establish a spectral catalogue of the intermediate ionization states of iron, Fe IX - Fe XXIV, in the extreme ultraviolet. The measurements are being performed in support of the development of reliable modeling codes for the analysis of data from the Extreme Ultraviolet Explorer and future space astrophysics missions sensitive to extreme ultraviolet radiation. They aim to resolve the controversies surrounding the short-wavelength spectra of stellar coronae. Preliminary measurements showing the wealth of iron lines in the 50-120 {Angstrom} region are presented.

  15. Extreme Ultraviolet Emission Lines of Iron Fe XI-XIII

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan; Beiersdorfer, P.; Brown, G. V.; Liedahl, D. A.; Brickhouse, N. S.; Dupree, A. K.

    2013-04-01

    The extreme ultraviolet (EUV) spectral region (ca. 20--300 Å) is rich in emission lines from low- to mid-Z ions, particularly from the middle charge states of iron. Many of these emission lines are important diagnostics for astrophysical plasmas, providing information on properties such as elemental abundance, temperature, density, and even magnetic field strength. In recent years, strides have been made to understand the complexity of the atomic levels of the ions that emit the lines that contribute to the richness of the EUV region. Laboratory measurements have been made to verify and benchmark the lines. Here, we present laboratory measurements of Fe XI, Fe XII, and Fe XIII between 40-140 Å. The measurements were made at the Lawrence Livermore electron beam ion trap (EBIT) facility, which has been optimized for laboratory astrophysics, and which allows us to select specific charge states of iron to help line identification. We also present new calculations by the Hebrew University - Lawrence Livermore Atomic Code (HULLAC), which we also utilized for line identification. We found that HULLAC does a creditable job of reproducing the forest of lines we observed in the EBIT spectra, although line positions are in need of adjustment, and line intensities often differed from those observed. We identify or confirm a number of new lines for these charge states. This work was supported by the NASA Solar and Heliospheric Program under Contract NNH10AN31I and the DOE General Plasma Science program. Work was performed in part under the auspices of the Department of Energy by Lawrence Livermore National Laboratory under Contract DEAC52-07NA27344.

  16. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination.

  17. Multilayer coatings for the far and extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Larruquert, Juan I.; Vidal-Dasilva, Manuela; García-Cortés, Sergio; Rodríguez-de Marcos, Luis; Fernández-Perea, Mónica; Aznárez, José A.; Méndez, José A.

    2011-05-01

    We present the development of novel coatings for the far and extreme ultraviolet (FUV-EUV). In the EUV above ~50 nm, the strong absorption of materials has precluded the development of narrowband coatings. An extensive research has been performed on the search and characterization of new materials with low absorption; the lanthanide series has been found to be a source of materials with relatively low absorption in the range of interest. The discovery of a wealth of materials with relatively low EUV absorption is basic to develop efficient multilayers, particularly with narrowband properties. In this way, we have developed multilayers based on Yb, Al, and SiO with narrowband performance in the 50-92 nm range; these are first narrowband coatings peaked above 70 nm. Our recent research on multilayers based on Eu, Al, and SiO provide promising results, with an increase in the peak reflectance versus Yb/Al/SiO multilayers, along with a peak wavelength that can be extended up to ~100 nm. For applications where FUV-EUV narrowband coatings have not been able to be prepared, we can design multilayers that address specific purposes, such as maximizing the reflectance ratio at two wavelengths or bands. Our first goal in this direction is the development of coatings with high 102.6 nm/ 121.6 nm reflectance ratio. Calculations predict that a high reflectance at Lyman β with a good rejection at Lyman α can be obtained through multilayer coatings. We are at the beginning of experimental research for this goal.

  18. Reconstruction of Solar Extreme Ultraviolet Flux 1740 - 2015

    NASA Astrophysics Data System (ADS)

    Svalgaard, Leif

    2016-11-01

    Solar extreme ultraviolet (EUV) radiation creates the conducting E-layer of the ionosphere, mainly by photo-ionization of molecular oxygen. Solar heating of the ionosphere creates thermal winds, which by dynamo action induce an electric field driving an electric current having a magnetic effect observable on the ground, as was discovered by G. Graham in 1722. The current rises and falls with the Sun, and thus causes a readily observable diurnal variation of the geomagnetic field, allowing us to deduce the conductivity and thus the EUV flux as far back as reliable magnetic data reach. High-quality data go back to the "Magnetic Crusade" of the 1830s and less reliable, but still usable, data are available for portions of the 100 years before that. J.R. Wolf and, independently, J.-A. Gautier discovered the dependence of the diurnal variation on solar activity, and today we understand and can invert that relationship to construct a reliable record of the EUV flux from the geomagnetic record. We compare that to the F_{10.7} flux and the sunspot number, and we find that the reconstructed EUV flux reproduces the F_{10.7} flux with great accuracy. On the other hand, it appears that the Relative Sunspot Number as currently defined is beginning to no longer be a faithful representation of solar magnetic activity, at least as measured by the EUV and related indices. The reconstruction suggests that the EUV flux reaches the same low (but non-zero) value at every sunspot minimum (possibly including Grand Minima), representing an invariant "solar magnetic ground state".

  19. Sources for beyond extreme ultraviolet lithography and water window imaging

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheil, John; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; White, Elgiva; Higashiguchi, Takeshi

    2015-05-01

    Lithography tools are being built and shipped to semiconductor manufacturers for high volume manufacturing using extreme ultraviolet lithography (EUVL) at a wavelength of 13.5 nm. This wavelength is based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Moreover, the primary lithography tool manufacturer, ASML, has identified 6.x nm, where x˜7, as the wavelength of choice for so-called Beyond EUVL, based on the availability of La/B4C MLMs, with theoretical reflectance approaching 80% at this wavelength. The optimum sources have been identified as laser produced plasmas of Gd and Tb, as n = 4-n = 4 transitions in their ions emit strongly near this wavelength. However, to date, the highest conversion efficiency obtained, for laser to EUV energy emitted within the 0.6% wavelength bandwidth of the mirror is only 0.8%, pointing to the need to identify other potential sources or consider the selection of other wavelengths. At the same time, sources for other applications are being developed. Conventional sources for soft x-ray microscopy use H-like line emission from liquid nitrogen or carbon containing liquid jets which can be focused using zone plates. Recently the possibility of using MLMs with n = 4-n = 4 emission from a highly charged Bi plasma was proposed and subsequently the possibility of using Δn = 1 transitions in 3rd row transition elements was identified. All of these studies seek to identify spectral features that coincide with the reflectance characteristics of available MLMs, determine the conditions under which they are optimized and establish the maximum conversion efficiencies obtainable. Thus, there is a need for systematic studies of laser produced plasmas of a wide range of elements as some of the challenges are similar for all of these sources and some recent results will be presented.

  20. Solar extreme ultraviolet sensor and advanced langmuir probe

    NASA Technical Reports Server (NTRS)

    Voronka, N. R.; Block, B. P.; Carignan, G. R.

    1992-01-01

    For more than two decades, the staff of the Space Physics Research Laboratory (SPRL) has collaborated with the Goddard Space Flight Center (GSFC) in the design and implementation of Langmuir probes (LP). This program of probe development under the direction of Larry Brace of GSFC has evolved methodically with innovations to: improve measurement precision, increase the speed of measurement, and reduce the weight, size, power consumption and data rate of the instrument. Under contract NAG5-419 these improvements were implemented and are what characterize the Advanced Langmuir Probe (ALP). Using data from the Langmuir Probe on the Pioneer Venus Orbiter, Brace and Walter Hoegy of GSFC demonstrated a novel method of monitoring the solar extreme ultraviolet (EUV) flux. This led to the idea of developing a sensor similar to a Langmuir probe specifically designed to measure solar EUV (SEUV) that uses a similar electronics package. Under this contract, a combined instrument package of the ALP and SEUV sensor was to be designed, constructed, and laboratory tested. Finally the instrument was to be flight tested as part of sounding rocket experiment to acquire the necessary data to validate this method for possible use in future earth and planetary aeronomy missions. The primary purpose of this contract was to develop the electronics hardware and software for this instrument, since the actual sensors were suppied by GSFC. Due to budget constraints, only a flight model was constructed. These electronics were tested and calibrated in the laboratory, and then the instrument was integrated into the rocket payload at Wallops Flight Facility where it underwent environmental testing. After instrument recalibration at SPRL, the payload was reintegrated and launched from the Poker Flat Research Range near Fairbanks Alaska. The payload was successfully recovered and after refurbishment underwent further testing and developing to improve its performance for future use.

  1. NEW SOLAR EXTREME-ULTRAVIOLET IRRADIANCE OBSERVATIONS DURING FLARES

    SciTech Connect

    Woods, Thomas N.; Hock, Rachel; Eparvier, Frank; Jones, Andrew R.; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Warren, Harry; Schrijver, Carolus J.; Webb, David F.; Bailey, Scott; Tobiska, W. Kent

    2011-10-01

    New solar extreme-ultraviolet (EUV) irradiance observations from the NASA Solar Dynamics Observatory (SDO) EUV Variability Experiment provide full coverage in the EUV range from 0.1 to 106 nm and continuously at a cadence of 10 s for spectra at 0.1 nm resolution and even faster, 0.25 s, for six EUV bands. These observations can be decomposed into four distinct characteristics during flares. First, the emissions that dominate during the flare's impulsive phase are the transition region emissions, such as the He II 30.4 nm. Second, the hot coronal emissions above 5 MK dominate during the gradual phase and are highly correlated with the GOES X-ray. A third flare characteristic in the EUV is coronal dimming, seen best in the cool corona, such as the Fe IX 17.1 nm. As the post-flare loops reconnect and cool, many of the EUV coronal emissions peak a few minutes after the GOES X-ray peak. One interesting variation of the post-eruptive loop reconnection is that warm coronal emissions (e.g., Fe XVI 33.5 nm) sometimes exhibit a second large peak separated from the primary flare event by many minutes to hours, with EUV emission originating not from the original flare site and its immediate vicinity, but rather from a volume of higher loops. We refer to this second peak as the EUV late phase. The characterization of many flares during the SDO mission is provided, including quantification of the spectral irradiance from the EUV late phase that cannot be inferred from GOES X-ray diagnostics.

  2. Solar extreme ultraviolet variability of the quiet Sun

    NASA Astrophysics Data System (ADS)

    Shakeri, F.; Teriaca, L.; Solanki, S. K.

    2015-09-01

    The last solar minimum has been unusually quiet compared to the previous minima (since space-based radiometric measurements are available). The Sun's magnetic flux was substantially lower during this minimum. Some studies also show that the total solar irradiance during the minimum after cycle 23 may have dropped below the values known from the two minima prior to that. For chromospheric and coronal radiation, the situation is less clear-cut. The Sun's 10.7 cm flux shows a decrease of ~4% during the solar minimum in 2008 compared to the previous minimum, but Ca ii K does not. Here we consider additional wavelengths in the extreme ultraviolet (EUV), specifically transitions of He i at 584.3 Å and O v at 629.7 Å, of which the CDS spectrometer aboard SOHO has been taking regular scans along the solar central meridian since 1996. We analysed this unique dataset to verify if and how the radiance distribution undergoes measurable variations between cycle minima. To achieve this aim we determined the radiance distribution of quiet areas around the Sun centre. Concentrating on the last two solar minima, we found out that there is very little variation in the radiance distribution of the chromospheric spectral line He i between these minima. The same analysis shows a modest, although significant, 4% variation in the radiance distribution of the TR spectral line O v. These results are comparable to those obtained by earlier studies employing other spectral features, and they confirm that chromospheric indices display a small variation, whereas in the transition region a more significant reduction of the brighter features is visible.

  3. Angular distribution of ions and extreme ultraviolet emission in laser-produced tin droplet plasma

    SciTech Connect

    Chen, Hong; Duan, Lian; Lan, Hui; Wang, Xinbing Chen, Ziqi; Zuo, Duluo; Lu, Peixiang

    2015-05-21

    Angular-resolved ion time-of-flight spectra as well as extreme ultraviolet radiation in laser-produced tin droplet plasma are investigated experimentally and theoretically. Tin droplets with a diameter of 150 μm are irradiated by a pulsed Nd:YAG laser. The ion time-of-flight spectra measured from the plasma formed by laser irradiation of the tin droplets are interpreted in terms of a theoretical elliptical Druyvesteyn distribution to deduce ion density distributions including kinetic temperatures of the plasma. The opacity of the plasma for extreme ultraviolet radiation is calculated based on the deduced ion densities and temperatures, and the angular distribution of extreme ultraviolet radiation is expressed as a function of the opacity using the Beer–Lambert law. Our results show that the calculated angular distribution of extreme ultraviolet radiation is in satisfactory agreement with the experimental data.

  4. Research Studies on Extreme Ultraviolet and Soft X-Ray Lasers

    DTIC Science & Technology

    1990-03-28

    COSAT CODES I1. SUBJECT WMS (Contne on revern if neceuwy nd midntfy by block number) FIELD GROU SUB-GROUP Soft XRay Lasers; Extreme Ultraviolet Lasers...Tunable LasersE X-Ray Spectroscopy ,’ Microwaves 𔄃. ABSTRACT (Contnue on reven if neceuaq wd metfy by block number) -- The overall purpose of this...program has been to study the physics, technology, and spectroscopy of extreme ultraviolet (XUV) and soft x-ray lasers. The objective of the work was to

  5. Interstellar absorption of the extreme ultraviolet flux from two hot white dwarfs

    NASA Technical Reports Server (NTRS)

    Cash, W.; Bowyer, S.; Lampton, M.

    1979-01-01

    Photometric upper limits on the 300 A flux from the hot white dwarfs Feige 24 and G191-B2B are presented. The limits, which were obtained with a rocket-borne extreme ultraviolet imaging telescope, are interpreted as lower limits on the density of the intervening interstellar matter. The limits are used to investigate the state of interstellar gas within 100 pc. A local clumpiness factor, which is of value in planning future extreme ultraviolet observations, is derived.

  6. EUNIS: Extreme-Ultraviolet Normal-Incidence Spectrometer

    NASA Astrophysics Data System (ADS)

    Thomas, R. J.; Davila, J. M.

    2001-05-01

    GSFC is in the process of assembling an Extreme-Ultraviolet Normal-Incidence Spectrometer called EUNIS, to be flown as a sounding rocket payload. This instrument builds on the many technical innovations pioneered by our highly successful SERTS experiment, which has now flown a total of ten times, most recently last summer. The new design will have somewhat improved spatial and spectral resolutions, as well as two orders of magnitude greater sensitivity, permitting high signal/noise EUV spectroscopy with a temporal resolution near 1~second for the first time ever. In order to achieve such high time cadence, a novel detector system is being developed, based on Active-Pixel-Sensor electronics, a key component of our design. The high sensitivity of EUNIS will allow entirely new studies of transient coronal phenomena, such as the rapid loop dynamics seen by TRACE, and searches for non-thermal motions indicative of magnetic reconnection or wave heating. Another observing mode will be to raster a two dimensional region on the disk, giving data on much larger solar areas than could be covered with SERTS. The increased sensitivity will also permit useful EUV spectra at heights of 2--3~Rsun above the limb, where the transition between the static corona and the solar wind might occur. In addition, the new design features two independent optical systems, which more than double the spectral bandwidth covered on each flight. Its 300--370Å bandpass includes He~II 304Å and strong lines from Fe~XI--XVI, extending the current SERTS range of 300--355Å to further improve our ongoing series of calibration under-flights for SOHO/CDS and EIT. The second bandpass of 170--230Å has a sequence of very strong Fe~IX--XIV lines, and will allow under-flight support for two more channels on SOHO/EIT, two channels on TRACE, one on Solar-B/EIS, and all four channels on the STEREO/EUVI instrument. First flight of the new EUNIS payload is scheduled for 2002 October from White Sands Missile Range

  7. Optics and mechanisms for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B satellite.

    PubMed

    Korendyke, Clarence M; Brown, Charles M; Thomas, Roger J; Keyser, Christian; Davila, Joseph; Hagood, Robert; Hara, Hirohisa; Heidemann, Klaus; James, Adrian M; Lang, James; Mariska, John T; Moser, John; Moye, Robert; Myers, Steven; Probyn, Brian J; Seely, John F; Shea, John; Shepler, Ed; Tandy, Jason

    2006-12-01

    The Extreme-Ultraviolet Imaging Spectrometer (EIS) is the first of a new generation of normal-incidence, two-optical-element spectroscopic instruments developed for space solar extreme-ultraviolet astronomy. The instrument is currently mounted on the Solar-B satellite for a planned launch in late 2006. The instrument observes in two spectral bands, 170-210 A and 250-290 A. The spectrograph geometry and grating prescription were optimized to obtain excellent imaging while still maintaining readily achievable physical and fabrication tolerances. A refined technique using low ruling density surrogate gratings and optical metrology was developed to align the instrument with visible light. Slit rasters of the solar surface are obtained by mechanically tilting the mirror. A slit exchange mechanism allows selection among four slits at the telescope focal plane. Each slit is precisely located at the focal plane. The spectrograph imaging performance was optically characterized in the laboratory. The resolution was measured using the Mg iii and Ne iii lines in the range of 171-200 A. The He ii line at 256 A and Ne iii lines were used in the range of 251-284 A. The measurements demonstrate an equivalent resolution of ~2 arc sec? on the solar surface, in good agreement with the predicted performance. We describe the EIS optics, mechanisms, and measured performance.

  8. Non-perturbative twist of attosecond extreme-ultraviolet vortex beams

    NASA Astrophysics Data System (ADS)

    Hernández García, Carlos; Rego, Laura; San Román, Julio; Picón, Antonio; Plaja, Luis

    2017-02-01

    Extreme-ultraviolet (EUV) attosecond vortices carrying orbital angular momentum (OAM) are produced through high-order harmonic generation (HHG) from the nonlinear conversion of infrared twisted beams. While previous works demonstrated a linear scaling law of the vortex OAM content with the harmonic order, an unexpectedly rich scenario for the OAM buildup appears when HHG is driven by a vortex combination. The non-perturbative nature of HHG increases the OAM content of the attosecond vortices when the driving field presents an azimuthally varying intensity profile. We theoretically explore the underlying mechanisms for this diversity and disentangle the perturbative and non-perturbative nature in the generation of EUV attosecond twisted through numerical simulations.

  9. Ultrafast Extreme Ultraviolet Spectroscopy of Methylammonium Lead Iodide Perovskite for Carrier Specific Photophysics

    NASA Astrophysics Data System (ADS)

    Verkamp, Max A.; Lin, Ming-Fu; Ryland, Elizabeth S.; Benke, Kristin; Vura-Weis, Josh

    2017-06-01

    Methyl ammonium lead iodide (perovskite) is a leading candidate for next-generation solar cell devices. However, the fundamental photophysics responsible for its strong photovoltaic qualities are not fully understood. Ultrafast extreme ultraviolet (XUV) spectroscopy was used to investigate relaxation dynamics in perovskite with carrier specific signals arising from transitions from the common inner-shell level (I 4d) to the valence and conduction bands. Ultrashort (30 fs) pulses of XUV radiation in a broad spectrum (40-70 eV) were obtained using high-harmonic generation in a tabletop instrument. Transient absorption measurements with visible pump and XUV probe directly observed the dynamics of charge carriers after above-band and band-edge excitation.

  10. Polarization-ratio reflectance measurements in the extreme ultraviolet.

    PubMed

    Brimhall, N; Heilmann, N; Ware, M; Peatross, J

    2009-05-01

    We demonstrate a technique for determining optical constants of materials in the extreme UV from the ratio of p-polarized to s-polarized reflectance. The measurements are based on laser-generated high-order harmonics, which have easily rotatable linear polarization but that are prone to brightness fluctuations and systematic drifts during measurement. Rather than measure the absolute reflectance, we extract the optical constants of a material from the ratio of p-polarized to s-polarized reflectance at multiple incident angles. This has the advantage of dividing out long-term fluctuations and possible systematic errors. We show that the reflectance ratio is as sensitive as the absolute reflectance to material optical properties.

  11. The Limb-imaging Ionospheric and Thermospheric Extreme-ultraviolet Spectrograph (LITES)

    NASA Astrophysics Data System (ADS)

    Finn, S. C.; Stephan, A. W.; Cook, T.; Martel, J.; Chakrabarti, S.

    2014-12-01

    LITES (Limb-imaging Ionospheric and Thermospheric Extreme-ultraviolet Spectrograph) is a compact imaging spectrograph for remote sensing of the upper atmosphere and ionosphere. The instrument has been designed and built, and is undergoing testing and integration to prepare for flight aboard the International Space Station (ISS) as part of the Space Test Program STP-H5 mission. With a passband in the extreme-ultraviolet from 60 to 140 nm, LITES will be able to image several key spectral lines as it observes Earth's limb, such as the 61.7 and 83.4 nm O+ lines to probe the daytime ionosphere, and the 91.1 nm continuum and 135.6 nm neutral oxygen lines to remotely sense the nighttime ionosphere. LITES is one part of a comprehensive ionospheric instrument suite along with the GPS Radio Occultation and Ultraviolet Photometry-Colocated (GROUP-C) experiment which comprises a nadir-viewing UV photometer and a GPS receiver to measure radio occultation. Combined these experiments will provide unprecedented tomographic views of nighttime ionospheric structures on a global scale. We show how LITES observations will be complemented by ground-based data from an international network of digisondes, visible spectrographs, and imagers. These observatories will provide ground-truth for the LITES measurements which will span the globe and fill in the 70% of the Earth where no ground-based measurements are possible. We also present modeled LITES data highlighting improvements in sensitivity, bandwidth, and cadence from earlier-generation observatories. These improvements will allow for advanced studies of longitudinal variability in the low-latitude ionosphere and its transient structures such as ionospheric bubbles. This work was supported by NSF 1145166 and ONR N00014-13-1-0266 grants. Support for A. Stephan has been provided by the Office of Naval Research. LITES is part of the STP-H5 Payload, integrated and flown under the direction of the DoD Space Test Program.

  12. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Technical Reports Server (NTRS)

    Hock, R. A.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Chamberlin, P. C.; Woods, E. C.

    2010-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. . In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  13. Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications.

    PubMed

    Reddy, Pulikanti Guruprasad; Pal, Satyendra Prakash; Kumar, Pawan; Pradeep, Chullikkattil P; Ghosh, Subrata; Sharma, Satinder K; Gonsalves, Kenneth E

    2017-01-11

    The present report demonstrates the potential of a polyarylenesulfonium polymer, poly[methyl(4-(phenylthio)-phenyl)sulfoniumtrifluoromethanesulfonate] (PAS), as a versatile nonchemically amplified negative tone photoresist for next-generation lithography (NGL) applications starting from i-line (λ ∼ 365 nm) to extreme ultraviolet (EUV, λ ∼ 13.5 nm) lithography. PAS exhibited considerable contrast (γ), 0.08, toward EUV and patterned 20 nm features successfully.

  14. Chirped pulse amplification in an extreme-ultraviolet free-electron laser

    PubMed Central

    Gauthier, David; Allaria, Enrico; Coreno, Marcello; Cudin, Ivan; Dacasa, Hugo; Danailov, Miltcho Boyanov; Demidovich, Alexander; Di Mitri, Simone; Diviacco, Bruno; Ferrari, Eugenio; Finetti, Paola; Frassetto, Fabio; Garzella, David; Künzel, Swen; Leroux, Vincent; Mahieu, Benoît; Mahne, Nicola; Meyer, Michael; Mazza, Tommaso; Miotti, Paolo; Penco, Giuseppe; Raimondi, Lorenzo; Ribič, Primož Rebernik; Richter, Robert; Roussel, Eléonore; Schulz, Sebastian; Sturari, Luca; Svetina, Cristian; Trovò, Mauro; Walker, Paul Andreas; Zangrando, Marco; Callegari, Carlo; Fajardo, Marta; Poletto, Luca; Zeitoun, Philippe; Giannessi, Luca; De Ninno, Giovanni

    2016-01-01

    Chirped pulse amplification in optical lasers is a revolutionary technique, which allows the generation of extremely powerful femtosecond pulses in the infrared and visible spectral ranges. Such pulses are nowadays an indispensable tool for a myriad of applications, both in fundamental and applied research. In recent years, a strong need emerged for light sources producing ultra-short and intense laser-like X-ray pulses, to be used for experiments in a variety of disciplines, ranging from physics and chemistry to biology and material sciences. This demand was satisfied by the advent of short-wavelength free-electron lasers. However, for any given free-electron laser setup, a limit presently exists in the generation of ultra-short pulses carrying substantial energy. Here we present the experimental implementation of chirped pulse amplification on a seeded free-electron laser in the extreme-ultraviolet, paving the way to the generation of fully coherent sub-femtosecond gigawatt pulses in the water window (2.3–4.4 nm). PMID:27905401

  15. Chirped pulse amplification in an extreme-ultraviolet free-electron laser

    NASA Astrophysics Data System (ADS)

    Gauthier, David; Allaria, Enrico; Coreno, Marcello; Cudin, Ivan; Dacasa, Hugo; Danailov, Miltcho Boyanov; Demidovich, Alexander; di Mitri, Simone; Diviacco, Bruno; Ferrari, Eugenio; Finetti, Paola; Frassetto, Fabio; Garzella, David; Künzel, Swen; Leroux, Vincent; Mahieu, Benoît; Mahne, Nicola; Meyer, Michael; Mazza, Tommaso; Miotti, Paolo; Penco, Giuseppe; Raimondi, Lorenzo; Ribič, Primož Rebernik; Richter, Robert; Roussel, Eléonore; Schulz, Sebastian; Sturari, Luca; Svetina, Cristian; Trovò, Mauro; Walker, Paul Andreas; Zangrando, Marco; Callegari, Carlo; Fajardo, Marta; Poletto, Luca; Zeitoun, Philippe; Giannessi, Luca; de Ninno, Giovanni

    2016-12-01

    Chirped pulse amplification in optical lasers is a revolutionary technique, which allows the generation of extremely powerful femtosecond pulses in the infrared and visible spectral ranges. Such pulses are nowadays an indispensable tool for a myriad of applications, both in fundamental and applied research. In recent years, a strong need emerged for light sources producing ultra-short and intense laser-like X-ray pulses, to be used for experiments in a variety of disciplines, ranging from physics and chemistry to biology and material sciences. This demand was satisfied by the advent of short-wavelength free-electron lasers. However, for any given free-electron laser setup, a limit presently exists in the generation of ultra-short pulses carrying substantial energy. Here we present the experimental implementation of chirped pulse amplification on a seeded free-electron laser in the extreme-ultraviolet, paving the way to the generation of fully coherent sub-femtosecond gigawatt pulses in the water window (2.3-4.4 nm).

  16. Chirped pulse amplification in an extreme-ultraviolet free-electron laser.

    PubMed

    Gauthier, David; Allaria, Enrico; Coreno, Marcello; Cudin, Ivan; Dacasa, Hugo; Danailov, Miltcho Boyanov; Demidovich, Alexander; Di Mitri, Simone; Diviacco, Bruno; Ferrari, Eugenio; Finetti, Paola; Frassetto, Fabio; Garzella, David; Künzel, Swen; Leroux, Vincent; Mahieu, Benoît; Mahne, Nicola; Meyer, Michael; Mazza, Tommaso; Miotti, Paolo; Penco, Giuseppe; Raimondi, Lorenzo; Ribič, Primož Rebernik; Richter, Robert; Roussel, Eléonore; Schulz, Sebastian; Sturari, Luca; Svetina, Cristian; Trovò, Mauro; Walker, Paul Andreas; Zangrando, Marco; Callegari, Carlo; Fajardo, Marta; Poletto, Luca; Zeitoun, Philippe; Giannessi, Luca; De Ninno, Giovanni

    2016-12-01

    Chirped pulse amplification in optical lasers is a revolutionary technique, which allows the generation of extremely powerful femtosecond pulses in the infrared and visible spectral ranges. Such pulses are nowadays an indispensable tool for a myriad of applications, both in fundamental and applied research. In recent years, a strong need emerged for light sources producing ultra-short and intense laser-like X-ray pulses, to be used for experiments in a variety of disciplines, ranging from physics and chemistry to biology and material sciences. This demand was satisfied by the advent of short-wavelength free-electron lasers. However, for any given free-electron laser setup, a limit presently exists in the generation of ultra-short pulses carrying substantial energy. Here we present the experimental implementation of chirped pulse amplification on a seeded free-electron laser in the extreme-ultraviolet, paving the way to the generation of fully coherent sub-femtosecond gigawatt pulses in the water window (2.3-4.4 nm).

  17. Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

    NASA Astrophysics Data System (ADS)

    Sporre, John R.; Elg, Daniel T.; Kalathiparambil, Kishor K.; Ruzic, David N.

    2016-01-01

    A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation.

  18. Methods and apparatus for use with extreme ultraviolet light having contamination protection

    DOEpatents

    Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy; Klebanoff, Leonard E.; Delgado, Gildardo R.; Rader, Daniel J.; Geller, Anthony S.; Gallis, Michail A.

    2016-07-12

    An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

  19. Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Fujii, Shinya; Kozawa, Takahiro; Okamoto, Kazumasa; Santillan, Julius Joseph; Itani, Toshiro

    2015-11-01

    With the improvement of resolution, the shot noise effect becomes a serious concern in the lithography used for high-volume production of semiconductor devices. In this study, the shot noise limit of the sensitivity of chemically amplified resists was investigated from the viewpoint of sensitivity enhancement, assuming extreme ultraviolet lithography. The latent images of line-and-space patterns with 11 nm half-pitch were calculated using a Monte Carlo method. The effect of secondary electron blur was eliminated to clarify the shot noise limit of line edge roughness (LER). When the requirement for line width roughness (LWR) was assumed to be 10% critical dimension (CD), the shot noise limit of sensitivity was >100 mJ cm-2. For the 20% CD LWR, the shot noise limits of sensitivity for the 10, 20, and 30 wt % acid generator concentrations were 20, 9, and 7 mJ cm-2, respectively.

  20. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists

    NASA Astrophysics Data System (ADS)

    Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

    2014-03-01

    The resolution of extreme ultraviolet (EUV) lithography with chemically amplified resist processes has reached 16 nm (half-pitch). The development of chemically amplified resists is ongoing toward the 11 nm node. However, the stochastic effects are increasingly becoming a significant concern with the continuing shrinkage of features. In this study, the fluctuation of protected unit distribution caused by the stochastic effects during image formation was investigated assuming line-and-space patterns with 11 nm half-pitch. Contrary to expectations, the standard deviation of the number of protected units connected to a polymer after postexposure baking (PEB) did not differ from that for 16 nm half-pitch. The standard deviation after PEB increased with the effective reaction radius for deprotection and the initial standard deviation before PEB. Because of the severe requirements for resist processes, the stochastic effects in chemical reactions should be taken into account in the design of next-generation resists.

  1. Enhancement of laser plasma extreme ultraviolet emission by shockwave-laser interaction

    SciTech Connect

    Bruijn, Rene de; Koshelev, Konstantin N.; Zakharov, Serguei V.; Novikov, Vladimir G.; Bijkerk, Fred

    2005-04-15

    A double laser pulse heating scheme has been applied to generate plasmas with enhanced emission in the extreme ultraviolet (EUV). The plasmas were produced by focusing two laser beams (prepulse and main pulse) with a small spatial separation between the foci on a xenon gas jet target. Prepulses with ps-duration were applied to obtain high shockwave densities, following indications of earlier published results obtained using ns prepulses. EUV intensities around 13.5 nm and in the range 5-20 nm were recorded, and a maximum increase in intensity exceeding 2 was measured at an optimal delay of 140 ns between prepulse and main pulse. The gain in intensity is explained by the interaction of the shockwave produced by the prepulse with the xenon in the beam waist of the main pulse. Extensive simulation was done using the radiative magnetohydrodynamic code Z{sup *}.

  2. Recording oscillations of sub-micron size cantilevers by extreme ultraviolet Fourier transform holography.

    PubMed

    Monserud, Nils C; Malm, Erik B; Wachulak, Przemyslaw W; Putkaradze, Vakhtang; Balakrishnan, Ganesh; Chao, Weilun; Anderson, Erik; Carlton, David; Marconi, Mario C

    2014-02-24

    We recorded the fast oscillation of sub-micron cantilevers using time-resolved extreme ultraviolet (EUV) Fourier transform holography. A tabletop capillary discharge EUV laser with a wavelength of 46.9 nm provided a large flux of coherent illumination that was split using a Fresnel zone plate to generate the object and the reference beams. The reference wave was produced by the first order focus while a central opening in the zone plate provided a direct illumination of the cantilevers. Single-shot holograms allowed for the composition of a movie featuring the fast oscillation. Three-dimensional displacements of the object were determined as well by numerical back-propagation, or "refocusing" of the electromagnetic fields during the reconstruction of a single hologram.

  3. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

    PubMed

    Kunkemöller, Georg; Mass, Tobias W W; Michel, Ann-Katrin U; Kim, Hyun-Su; Brose, Sascha; Danylyuk, Serhiy; Taubner, Thomas; Juschkin, Larissa

    2015-10-05

    We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.

  4. Relativistic electron mirrors from nanoscale foils for coherent frequency upshift to the extreme ultraviolet.

    PubMed

    Kiefer, D; Yeung, M; Dzelzainis, T; Foster, P S; Rykovanov, S G; Lewis, C Ls; Marjoribanks, R S; Ruhl, H; Habs, D; Schreiber, J; Zepf, M; Dromey, B

    2013-01-01

    Reflecting light from a mirror moving close to the speed of light has been envisioned as a route towards producing bright X-ray pulses since Einstein's seminal work on special relativity. For an ideal relativistic mirror, the peak power of the reflected radiation can substantially exceed that of the incident radiation due to the increase in photon energy and accompanying temporal compression. Here we demonstrate for the first time that dense relativistic electron mirrors can be created from the interaction of a high-intensity laser pulse with a freestanding, nanometre-scale thin foil. The mirror structures are shown to shift the frequency of a counter-propagating laser pulse coherently from the infrared to the extreme ultraviolet with an efficiency >10(4) times higher than in the case of incoherent scattering. Our results elucidate the reflection process of laser-generated electron mirrors and give clear guidance for future developments of a relativistic mirror structure.

  5. Extreme ultraviolet emission from laser-induced plasma relevance to neutral gas environment simulation in LEO

    NASA Astrophysics Data System (ADS)

    Tagawa, Masahito; Kimoto, Yugo; Yokota, Kumiko; Ohira, Junki; Watanabe, Daiki; Nishimura, Hiroaki

    The reaction mechanism of atomic oxygen (AO) in low Earth orbit (LEO) with spacecraft materials has been studied by ground-based experiments using laser-detonation hyperthermal beam source, which enables to accelerate the electrically neutral AO up to 8 km/s. However, the beam conditions in the laser-detonation sources could not fully duplicate the AO environment in space. The difference in beam condition including side products leads to the different material responses. The light emission from the laser-induced oxygen plasma may affect the erosion of ultraviolet (UV)-sensitive materials. However, the light emission could also be used as a diagnostic tool to understand the molecular processes in plasma. In this presentation, extreme ultraviolet (EUV) emission from the laser-induced plasma during AO test was evaluated by the flat field EUV spectrometer. Many emission lines between 25-40 nm originated from OII and OIII were observed from the laser-induced oxygen plasma. This result suggested multiple-charged O ions are generated in the laser-induced plasma. Promotion of oxygen dissociation effect by adding Ar in the target gas was explained by the energy transfer processes from Ar to O2 in the plasma. From the viewpoint of reducing the side products in the AO exposure tests, a method to reduce the EUV emission will also be investigated. These results could be used for establishing more accurate ground-based natural gas simulations on the space environmental effect of materials.

  6. [Theoretical analysis and experimental measurement for secondary electron yield of microchannel plate in extreme ultraviolet region].

    PubMed

    Li, Min; Ni, Qi-liang; Dong, Ning-ning; Chen, Bo

    2010-08-01

    Photon counting detectors based on microchannel plate have widespread applications in astronomy. The present paper deeply studies secondary electron of microchannel plate in extreme ultraviolet. A theoretical model describing extreme ultraviolet-excited secondary electron yield is presented, and the factor affecting on the secondary electron yields of both electrode and lead glass which consist of microchannel plate is analyzed according to theoretical formula derived from the model. The result shows that the higher secondary electron yield is obtained under appropriate condition that the thickness of material is more than 20 nm and the grazing incidence angle is larger than the critical angle. Except for several wavelengths, the secondary electron yields of both electrode and lead glass decrease along with the increase in the wavelength And also the quantum efficiency of microchannel plate is measured using quantum efficiency test set-up with laser-produced plasmas source as an extreme ultraviolet radiation source, and the result of experiment agrees with theoretical analysis.

  7. Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

    NASA Technical Reports Server (NTRS)

    Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

    1988-01-01

    The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

  8. Laser triggered Z-pinch broadband extreme ultraviolet source for metrology

    SciTech Connect

    Tobin, I.; Lunney, J. G.; Juschkin, L.; Sidelnikov, Y.; O'Reilly, F.; Sokell, E.; Sheridan, P.

    2013-05-20

    We compare the extreme ultraviolet emission characteristics of tin and galinstan (atomic %: Ga: 78.35, In: 14.93, Sn: 6.72) between 10 nm and 18 nm in a laser-triggered discharge between liquid metal-coated electrodes. Over this wavelength range, the energy conversion efficiency for galinstan is approximately half that of tin, but the spectrum is less strongly peaked in the 13-15 nm region. The extreme ultraviolet source dimensions were 110 {+-} 25 {mu}m diameter and 500 {+-} 125 {mu}m length. The flatter spectrum, and -19 Degree-Sign C melting point, makes this galinstan discharge a relatively simple high radiance extreme ultraviolet light source for metrology and scientific applications.

  9. Extreme ultraviolet reflectivity studies of gold on glass and metal substrates

    NASA Technical Reports Server (NTRS)

    Jelinsky, Sharon R.; Malina, Roger F.; Jelinsky, Patrick

    1988-01-01

    The paper reports measurements of the extreme ultraviolet reflectivity of gold from 44 to 920 A at grazing incidence. Gold was deposited using vacuum evaporation and electroplating on substrates of glass and polished nickel, respectively. Measurements are also presented of the extreme ultraviolet reflectivity of electroless nickel in the same wavelength region, where one of the polished nickel substrates was used as a sample. Derived optical constants for evaporated and electroplated gold and electroless nickel are presented. Additional studies of the effects of various contaminants on the EUV reflectivity are also reported. The variations of the optical constants are discussed in terms of density variations, surface roughness and contamination effects. These results ae reported as part of studies for the Extreme Ultraviolet Explorer satellite program to determine acceptance criteria for the EUV optics, contamination budgets and calibration plans.

  10. Fabrication of high-resolution zone plates with wideband extreme-ultraviolet holography

    SciTech Connect

    Solak, Harun H.; David, Christian; Gobrecht, Jens

    2004-10-04

    We report an achromatic holographic method to fabricate high-resolution x-ray optics using coherent extreme-ultraviolet radiation from an undulator source. The interference pattern between two spherical beams, which are created using Fresnel zone plates, is recorded to produce a higher-resolution zone plate. Analytical and simulation results showing the formation of the zone plate pattern was confirmed experimentally with the production and testing of a lens with 60-nm outermost zone width. The combination of extreme-ultraviolet light, which exposes photoresists with practically no proximity effect, and holography, which guarantees the accurate placement of zones, addresses the main difficulties faced in the improvement of the resolution of x-ray lenses. Holography with extreme-ultraviolet light has the potential to produce lenses with sub-10-nm resolution.

  11. Three new extreme ultraviolet spectrometers on NSTX-U for impurity monitoring

    NASA Astrophysics Data System (ADS)

    Weller, M. E.; Beiersdorfer, P.; Soukhanovskii, V. A.; Magee, E. W.; Scotti, F.

    2016-11-01

    Three extreme ultraviolet (EUV) spectrometers have been mounted on the National Spherical Torus Experiment-Upgrade (NSTX-U). All three are flat-field grazing-incidence spectrometers and are dubbed X-ray and Extreme Ultraviolet Spectrometer (XEUS, 8-70 Å), Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS, 190-440 Å), and Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50-220 Å). XEUS and LoWEUS were previously implemented on NSTX to monitor impurities from low- to high-Z sources and to study impurity transport while MonaLisa is new and provides the system increased spectral coverage. The spectrometers will also be a critical diagnostic on the planned laser blow-off system for NSTX-U, which will be used for impurity edge and core ion transport studies, edge-transport code development, and benchmarking atomic physics codes.

  12. Three new extreme ultraviolet spectrometers on NSTX-U for impurity monitoring

    SciTech Connect

    Weller, M. E. Beiersdorfer, P.; Soukhanovskii, V. A.; Magee, E. W.; Scotti, F.

    2016-11-15

    Three extreme ultraviolet (EUV) spectrometers have been mounted on the National Spherical Torus Experiment–Upgrade (NSTX-U). All three are flat-field grazing-incidence spectrometers and are dubbed X-ray and Extreme Ultraviolet Spectrometer (XEUS, 8–70 Å), Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS, 190–440 Å), and Metal Monitor and Lithium Spectrometer Assembly (MonaLisa, 50–220 Å). XEUS and LoWEUS were previously implemented on NSTX to monitor impurities from low- to high-Z sources and to study impurity transport while MonaLisa is new and provides the system increased spectral coverage. The spectrometers will also be a critical diagnostic on the planned laser blow-off system for NSTX-U, which will be used for impurity edge and core ion transport studies, edge-transport code development, and benchmarking atomic physics codes.

  13. Atmosphere and water loss from early Mars under extreme solar wind and extreme ultraviolet conditions.

    PubMed

    Terada, Naoki; Kulikov, Yuri N; Lammer, Helmut; Lichtenegger, Herbert I M; Tanaka, Takashi; Shinagawa, Hiroyuki; Zhang, Tielong

    2009-01-01

    The upper limits of the ion pickup and cold ion outflow loss rates from the early martian atmosphere shortly after the Sun arrived at the Zero-Age-Main-Sequence (ZAMS) were investigated. We applied a comprehensive 3-D multi-species magnetohydrodynamic (MHD) model to an early martian CO(2)-rich atmosphere, which was assumed to have been exposed to a solar XUV [X-ray and extreme ultraviolet (EUV)] flux that was 100 times higher than today and a solar wind that was about 300 times denser. We also assumed the late onset of a planetary magnetic dynamo, so that Mars had no strong intrinsic magnetic field at that early period. We found that, due to such extreme solar wind-atmosphere interaction, a strong magnetic field of about approximately 4000 nT was induced in the entire dayside ionosphere, which could efficiently protect the upper atmosphere from sputtering loss. A planetary obstacle ( approximately ionopause) was formed at an altitude of about 1000 km above the surface due to the drag force and the mass loading by newly created ions in the highly extended upper atmosphere. We obtained an O(+) loss rate by the ion pickup process, which takes place above the ionopause, of about 1.5 x 10(28) ions/s during the first < or =150 million years, which is about 10(4) times greater than today and corresponds to a water loss equivalent to a global martian ocean with a depth of approximately 8 m. Consequently, even if the magnetic protection due to the expected early martian magnetic dynamo is neglected, ion pickup and sputtering were most likely not the dominant loss processes for the planet's initial atmosphere and water inventory. However, it appears that the cold ion outflow into the martian tail, due to the transfer of momentum from the solar wind to the ionospheric plasma, could have removed a global ocean with a depth of 10-70 m during the first < or =150 million years after the Sun arrived at the ZAMS.

  14. Concept Study Report: Extreme-Ultraviolet Imaging Spectrometer Solar-B

    NASA Technical Reports Server (NTRS)

    Doschek, George, A.; Brown, Charles M.; Davila, Joseph M.; Dere, Kenneth P.; Korendyke, Clarence M.; Mariska, John T.; Seely, John F.

    1999-01-01

    We propose a next generation Extreme-ultraviolet Imaging Spectrometer (EIS) that for the first time combines high spectral, spatial, and temporal resolution in a single solar spectroscopic instrument. The instrument consists of a multilayer-coated off-axis telescope mirror and a multilayer-coated grating spectrometer. The telescope mirror forms solar images on the spectrometer entrance slit assembly. The spectrometer forms stigmatic spectra of the solar region located at the slit. This region is selected by the articulated telescope mirror. Monochromatic images are obtained either by rastering the solar region across a narrow entrance slit, or by using a very wide slit (called a slot) in place of the slit. Monochromatic images of the region centered on the slot are obtained in a single exposure. Half of each optic is coated to maximize reflectance at 195 Angstroms; the other half to maximize reflectance at 270 Angstroms. The two Extreme Ultraviolet (EUV) wavelength bands have been selected to maximize spectral and dynamical and plasma diagnostic capabilities. Spectral lines are observed that are formed over a temperature range from about 0.1 MK to about 20 MK. The main EIS instrument characteristics are: wavelength bands - 180 to 204 Angstroms; 250 to 290 Angstroms; spectral resolution - 0.0223 Angstroms/pixel (34.3km/s at 195 Angstroms and 23.6 km/s at 284 Angstroms); slit dimensions - 4 slits, two currently specified dimensions are 1" x 1024" and 50" x 1024" (the slot); largest spatial field of view in a single exposure - 50" x 1024"; highest time resolution for active region velocity studies - 4.4 s.

  15. Sun's image in the extreme ultraviolet radiation emitted from the corona

    NASA Technical Reports Server (NTRS)

    1973-01-01

    The Skylab space station's Extreme Ultraviolet monitor is a closed loop television system that permitted man for the first time to watch the Sun's image in the extreme ultraviolet radiation emitted from its million-degree outer atmosphere, the corona. This photograph shows a view of the TV scope made by Scientist-Astronaut Owen K. Garriott, Skylab 3 science pilot, on August 15, 1973. Dr. Garriott made this picture with a Land-Polaroid SX-70 camera - the first time that any Polaroid camera has been used in space.

  16. Flat field response of the microchannel plate detectors used on the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Gibson, J. L.; Siegmund, O. H. W.; Vedder, P. W.

    1989-01-01

    The results of the extreme ultraviolet (EUV) flat field calibrations of two of the flight detectors to be flown on the Extreme Ultraviolet Explorer Satellite (EUVE) are presented. Images of about 40 million detected events binned 512 by 512 are sufficient to show microchannel plate fixed pattern noise such as hexagonal microchannel multifiber bundle interfaces, 'dead' spots, edge distortion, and differential nonlinearity. Differences due to photocathode material and dependencies on EUV wavelength are also described. Over large spatial scales, the detector response is flat to better than 10 percent of the mean response, but, at spatial scales less than 1 mm, the variations from the mean can be as large as 20 percent.

  17. Wave-mixing with high-order harmonics in extreme ultraviolet region

    SciTech Connect

    Dao, Lap Van; Dinh, Khuong Ba; Le, Hoang Vu; Gaffney, Naylyn; Hannaford, Peter

    2015-01-12

    We report studies of the wave-mixing process in the extreme ultraviolet region with two near-infrared driving and controlling pulses with incommensurate frequencies (at 1400 nm and 800 nm). A non-collinear scheme for the two beams is used in order to spatially separate and to characterise the properties of the high-order wave-mixing field. We show that the extreme ultraviolet frequency mixing can be treated by perturbative, very high-order nonlinear optics; the modification of the wave-packet of the free electron needs to be considered in this process.

  18. Flat field response of the microchannel plate detectors used on the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Gibson, J. L.; Siegmund, O. H. W.; Vedder, P. W.

    1989-01-01

    The results of the extreme ultraviolet (EUV) flat field calibrations of two of the flight detectors to be flown on the Extreme Ultraviolet Explorer Satellite (EUVE) are presented. Images of about 40 million detected events binned 512 by 512 are sufficient to show microchannel plate fixed pattern noise such as hexagonal microchannel multifiber bundle interfaces, 'dead' spots, edge distortion, and differential nonlinearity. Differences due to photocathode material and dependencies on EUV wavelength are also described. Over large spatial scales, the detector response is flat to better than 10 percent of the mean response, but, at spatial scales less than 1 mm, the variations from the mean can be as large as 20 percent.

  19. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C.; Chow, W.W.

    1995-06-01

    Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.

  20. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet

    DOE PAGES

    Géneaux, R.; Camper, A.; Auguste, T.; ...

    2016-08-30

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterizemore » helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. Furthermore, these breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices.« less

  1. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet

    PubMed Central

    Géneaux, R.; Camper, A.; Auguste, T.; Gobert, O.; Caillat, J.; Taïeb, R.; Ruchon, T.

    2016-01-01

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. These breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices. PMID:27573787

  2. Synthesis and characterization of attosecond light vortices in the extreme ultraviolet

    SciTech Connect

    Géneaux, R.; Camper, A.; Auguste, T.; Gobert, O.; Caillat, J.; Taïeb, R.; Ruchon, Thierry

    2016-08-30

    Infrared and visible light beams carrying orbital angular momentum (OAM) are currently thoroughly studied for their extremely broad applicative prospects, among which are quantum information, micromachining and diagnostic tools. Here we extend these prospects, presenting a comprehensive study for the synthesis and full characterization of optical vortices carrying OAM in the extreme ultraviolet (XUV) domain. We confirm the upconversion rules of a femtosecond infrared helically phased beam into its high-order harmonics, showing that each harmonic order carries the total number of OAM units absorbed in the process up to very high orders (57). This allows us to synthesize and characterize helically shaped XUV trains of attosecond pulses. To demonstrate a typical use of these new XUV light beams, we show our ability to generate and control, through photoionization, attosecond electron beams carrying OAM. Furthermore, these breakthroughs pave the route for the study of a series of fundamental phenomena and the development of new ultrafast diagnosis tools using either photonic or electronic vortices.

  3. Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering

    NASA Astrophysics Data System (ADS)

    Beyene, Girum A.; Tobin, Isaac; Juschkin, Larissa; Hayden, Patrick; O'Sullivan, Gerry; Sokell, Emma; Zakharov, Vassily S.; Zakharov, Sergey V.; O'Reilly, Fergal

    2016-06-01

    Extreme ultraviolet (EUV) light generation by hybrid laser-assisted vacuum arc discharge plasmas, utilizing Sn-coated rotating-disc-electrodes, was investigated. The discharge was initiated by localized ablation of the liquid tin coating of the cathode disc by a laser pulse. The laser pulse, at 1064 nm, was generated by Nd:YAG lasers with variable energy from 1 to 100 mJ per pulse. The impact of shortening the laser pulse from 7 ns to 170 ps on the EUV generation has been investigated in detail. The use of ps pulses resulted in an increase in emission of EUV radiation. With a fixed discharge energy of ~4 J, the EUV conversion efficiency tends to plateau at ~2.4  ±  0.25% for the ps laser pulses, while for the ns pulses, it saturates at ~1.7  ±  0.3%. Under similar discharge and laser energy conditions, operating the EUV source with the ps-triggering resulted also in narrower spectral profiles of the emission in comparison to ns-triggering. The results indicate an advantage in using ps-triggering in laser-assisted discharges to produce brighter plasmas required for applications such as metrology.

  4. IUE spectra of Feige 4, a suspected source of extreme-ultraviolet radiation

    NASA Technical Reports Server (NTRS)

    Holm, A. V.; Boggess, A.

    1982-01-01

    IUE spectra are presented for Feige 4, a DB-type white dwarf. The observed energy distribution is in good agreement with that predicted by a model atmosphere with an effective temperature of 15,500 K and having extremely low hydrogen and metal abundances. These results are evidence against Feige 4 being the source of the apparent extreme-ultraviolet signal detected by Prognoz 6.

  5. Solar Power Generation in Extreme Space Environments

    NASA Technical Reports Server (NTRS)

    Elliott, Frederick W.; Piszczor, Michael F.

    2016-01-01

    The exploration of space requires power for guidance, navigation, and control; instrumentation; thermal control; communications and data handling; and many subsystems and activities. Generating sufficient and reliable power in deep space through the use of solar arrays becomes even more challenging as solar intensity decreases and high radiation levels begin to degrade the performance of photovoltaic devices. The Extreme Environments Solar Power (EESP) project goal is to develop advanced photovoltaic technology to address these challenges.

  6. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period through June 2001, Phase C/D, Detailed Design and Development Through Launch Plus Thirty Days, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  7. SOLAR-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2001-01-01

    This Monthly Progress Report covers the reporting period July 2001 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme Ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  8. Solar-B Mission Extreme Ultraviolet (EUV) Imaging Spectrometer (EIS) Instrument Components

    NASA Technical Reports Server (NTRS)

    Doschek, George A.

    2002-01-01

    This Monthly Progress Report covers the reporting period August 2002 of the Detailed Design and Development through Launch plus Thirty Days, Phase C/D, for selected components and subsystems of the Extreme ultraviolet Imaging Spectrometer (EIS) instrument, hereafter referred to as EIS Instrument Components. This document contains the program status through the reporting period and forecasts the status for the upcoming reporting period.

  9. Extension of free-electron lasers into the extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Newnam, Brian E.

    1988-07-01

    A development status evaluation is presented for efforts aimed at extending electron accelerator-based FEL operation to the extreme UV range, where currently no powerful, tunable source of coherent radiation exists. Attention is given to the Stanford X-ray Center's storage ring-powered FEL, and to the design parameters of such RF-linac FELs operating in the UV-to-soft X-ray regions as the projected Los Alamos RF-linac-powered FEL facility. The outlines of FEL amplifiers based on self-amplified spontaneous emission and regenerative FEL amplifiers are presented; the technological maturity of long undulators and resonator mirrors for this wavelength is then assessed.

  10. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  11. Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    NASA Astrophysics Data System (ADS)

    Madey, Theodore E.; Faradzhev, Nadir S.; Yakshinskiy, Boris V.; Edwards, N. V.

    2006-12-01

    One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ˜2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H 2O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.

  12. Ptychographic imaging with a compact gas-discharge plasma extreme ultraviolet light source.

    PubMed

    Odstrcil, M; Bussmann, J; Rudolf, D; Bresenitz, R; Miao, Jianwei; Brocklesby, W S; Juschkin, L

    2015-12-01

    We report the demonstration of a scanning probe coherent diffractive imaging method (also known as ptychographic CDI) using a compact and partially coherent gas-discharge plasma source of extreme ultraviolet (EUV) radiation at a 17.3 nm wavelength. Until now, CDI has been mainly carried out with coherent, high-brightness light sources, such as third generation synchrotrons, x-ray free-electron lasers, and high harmonic generation. Here we performed ptychographic lensless imaging of an extended sample using a compact, lab-scale source. The CDI reconstructions were achieved by applying constraint relaxation to the CDI algorithm. Experimental results indicate that our method can handle the low spatial coherence and broadband nature of the EUV illumination, as well as the residual background due to visible light emitted by the gas-discharge source. The ability to conduct ptychographic imaging with lab-scale and partially coherent EUV sources is expected to significantly expand the applications of this powerful CDI method.

  13. Benchmark Generation and Simulation at Extreme Scale

    SciTech Connect

    Lagadapati, Mahesh; Mueller, Frank; Engelmann, Christian

    2016-01-01

    The path to extreme scale high-performance computing (HPC) poses several challenges related to power, performance, resilience, productivity, programmability, data movement, and data management. Investigating the performance of parallel applications at scale on future architectures and the performance impact of different architectural choices is an important component of HPC hardware/software co-design. Simulations using models of future HPC systems and communication traces from applications running on existing HPC systems can offer an insight into the performance of future architectures. This work targets technology developed for scalable application tracing of communication events. It focuses on extreme-scale simulation of HPC applications and their communication behavior via lightweight parallel discrete event simulation for performance estimation and evaluation. Instead of simply replaying a trace within a simulator, this work promotes the generation of a benchmark from traces. This benchmark is subsequently exposed to simulation using models to reflect the performance characteristics of future-generation HPC systems. This technique provides a number of benefits, such as eliminating the data intensive trace replay and enabling simulations at different scales. The presented work features novel software co-design aspects, combining the ScalaTrace tool to generate scalable trace files, the ScalaBenchGen tool to generate the benchmark, and the xSim tool to assess the benchmark characteristics within a simulator.

  14. A study of extreme-ultraviolet emission from cataclysmic variables

    NASA Technical Reports Server (NTRS)

    Polidan, Ronald S.; Mauche, Christopher W.; Wade, Richard A.

    1990-01-01

    Voyager far- and extreme UV spectrophotometric observations of five cataclysmic variables (the dwarf novae SS Cyg and VW Hyi and the novalike variables V3885 Sgr, RW Sex, and IX Vel) are combined with neutral hydrogen column densities derived from the curve-of-growth analysis of interstellar absorption lines in high-resolution IUE spectra to place upper limits on the emitted flux in the 600-700 A EUV band. The Voyager observations of VW Hyi were obtained during both normal and superoutbursts. Detailed accretion disk model calculations show that most of the 600-700 A flux in these systems should originate in the inner accretion disk rather than in the boundary layer. For VW Hyi, the low neutral hydrogen column and excellent Voyager superoutburst data place the observed upper limit to the 600-700 A flux well below the expected EUV flux from the model calculations.

  15. An Optics Free Spectrometer for the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Judge, D. L.; Daybell, M. D.; Hoffman, J. R.; Gruntman, M. A.; Ogawa, H. S.; Samson, J. A. R.

    1994-01-01

    The optics-free spectrometer is a photon spectrometer. It provides the photon spectrum of a broadband source by converting photons of energy E into electrons of energy E', according to the Einstein relation, E' = E - Ei. E, is the ionization threshold of the gas target of interest (any of the rare gases are suitable) and E is the incoming photon energy. As is evident from the above equation, only a single order spectrum is produced throughout the energy range between the first and second ionization potentials of the rare gas used. Photons with energy above the second ionization potential produce two groups of electrons, but they are readily distinguished from each other. This feature makes this device extremely useful for determining the true spectrum of a continuum source or a many line source. The principle of operation and the laboratory results obtained with a representative configuration of the optics-free spectrometer are presented.

  16. High average power ultraviolet picosecond optical vortex generation

    NASA Astrophysics Data System (ADS)

    Sasaki, Yuta; Kowa, Maya; Yamaguchi, Koki; Shibakawa, Jun; Miyamoto, Katsuhiko; Omatsu, Takashige

    2017-04-01

    We reported on high average power ultraviolet (UV) picosecond optical vortex generation without any spatial separation of the phase singularity due to the walk-off effect by employing a pair of β-BaB2O4 and reversed β-BaB2O4 crystals. The UV vortex output power was measured to be 1.76 W, corresponding to the optical-optical conversion efficiency of 17 %.

  17. Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy.

    PubMed

    Lin, Jingquan; Weber, Nils; Escher, Matthias; Maul, Jochen; Han, Hak-Seung; Merkel, Michael; Wurm, Stefan; Schönhense, Gerd; Kleineberg, Ulf

    2008-09-29

    A photoemission electron microscope based on a new contrast mechanism "interference contrast" is applied to characterize extreme ultraviolet lithography mask blank defects. Inspection results show that positioning of interference destructive condition (node of standing wave field) on surface of multilayer in the local region of a phase defect is necessary to obtain best visibility of the defect on mask blank. A comparative experiment reveals superiority of the interference contrast photoemission electron microscope (Extreme UV illumination) over a topographic contrast one (UV illumination with Hg discharge lamp) in detecting extreme ultraviolet mask blank phase defects. A depth-resolved detection of a mask blank defect, either by measuring anti-node peak shift in the EUV-PEEM image under varying inspection wavelength condition or by counting interference fringes with a fixed illumination wavelength, is discussed.

  18. Extreme Ultraviolet Variability Experiment (EVE) Multiple EUV Grating Spectrographs (MEGS): Radiometric Calibrations and Results

    NASA Astrophysics Data System (ADS)

    Hock, R. A.; Chamberlin, P. C.; Woods, T. N.; Crotser, D.; Eparvier, F. G.; Woodraska, D. L.; Woods, E. C.

    2012-01-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in early 2010, incorporates a suite of instruments including the Extreme Ultraviolet Variability Experiment (EVE). EVE has multiple instruments including the Multiple Extreme ultraviolet Grating Spectrographs (MEGS) A, B, and P instruments, the Solar Aspect Monitor (SAM), and the Extreme ultraviolet SpectroPhotometer (ESP). The radiometric calibration of EVE, necessary to convert the instrument counts to physical units, was performed at the National Institute of Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF III) located in Gaithersburg, Maryland. This paper presents the results and derived accuracy of this radiometric calibration for the MEGS A, B, P, and SAM instruments, while the calibration of the ESP instrument is addressed by Didkovsky et al. ( Solar Phys., 2010, doi:10.1007/s11207-009-9485-8). In addition, solar measurements that were taken on 14 April 2008, during the NASA 36.240 sounding-rocket flight, are shown for the prototype EVE instruments.

  19. Second Topical Meeting on Laser Techniques in the Extreme Ultraviolet.

    DTIC Science & Technology

    1985-01-10

    lasers. Cenfined Plasma Column, S. Suckewer, C. Keane, H. .-Milchborg, C. H. Skinner , and D. Voorhees, Plasma Physics-- 1&.30 AM COFFEE BREAK...and Cr) and carbon (2d = 150 ,) from 80 to 350 eV. Spectrometer configurations composed of variable-line-space IT. J. Watson Research Center, IBM...EUV Une I (Poster Paper) Intensities in Co,.-Laser-Produced Plasmas, C. H. Skinner , C. lent Generation of Tunable Radiation below 100 nm In Keane, H

  20. EUV SpectroPhotometer (ESP) in Extreme Ultraviolet Variability Experiment (EVE): Algorithms and Calibrations

    NASA Astrophysics Data System (ADS)

    Didkovsky, L.; Judge, D.; Wieman, S.; Woods, T.; Jones, A.

    2012-01-01

    The Extreme ultraviolet SpectroPhotometer (ESP) is one of five channels of the Extreme ultraviolet Variability Experiment (EVE) onboard the NASA Solar Dynamics Observatory (SDO). The ESP channel design is based on a highly stable diffraction transmission grating and is an advanced version of the Solar Extreme ultraviolet Monitor (SEM), which has been successfully observing solar irradiance onboard the Solar and Heliospheric Observatory (SOHO) since December 1995. ESP is designed to measure solar Extreme UltraViolet (EUV) irradiance in four first-order bands of the diffraction grating centered around 19 nm, 25 nm, 30 nm, and 36 nm, and in a soft X-ray band from 0.1 to 7.0 nm in the zeroth-order of the grating. Each band’s detector system converts the photo-current into a count rate (frequency). The count rates are integrated over 0.25-second increments and transmitted to the EVE Science and Operations Center for data processing. An algorithm for converting the measured count rates into solar irradiance and the ESP calibration parameters are described. The ESP pre-flight calibration was performed at the Synchrotron Ultraviolet Radiation Facility of the National Institute of Standards and Technology. Calibration parameters were used to calculate absolute solar irradiance from the sounding-rocket flight measurements on 14 April 2008. These irradiances for the ESP bands closely match the irradiance determined for two other EUV channels flown simultaneously: EVE’s Multiple EUV Grating Spectrograph (MEGS) and SOHO’s Charge, Element and Isotope Analysis System/ Solar EUV Monitor (CELIAS/SEM).

  1. Changes of solar extreme ultraviolet spectrum in solar cycle 24

    NASA Astrophysics Data System (ADS)

    Hao, Yongqiang; Zhang, Donghe; Xiao, Zuo; Huang, Jianping

    2016-07-01

    Following the extreme solar minimum during 2008 - 2009, solar activity keeps low in solar cycle 24 (SC24) and is making SC24 the weakest one of recent cycles. In this paper, we compare the solar EUV spectral irradiance between SC23 and SC24, using the measurements by the Solar EUV Experiment (SEE) on the Thermospheric Ionospheric Mesospheric Energy and Dynamics (TIMED) spacecraft. The EUV spectrum varies with solar activity, and is in general a linear function of a proxy index P= (F10.7 + F10.7A)/2. However, we find the slope of this function, i.e., the change rate of irradiance at each wavelength with P, differs between SC23 and SC24. Consequently, at a given P level, the irradiance in SC24 is higher at wavelength of 30 - 50 nm, but lower at 60 - 120 nm and longward of 140 nm; the inter-cycle variation of EUV irradiance at some wavelengths can be 30 - 40% in absolute flux. We further examine 38 most intense emission lines and find that, taking P as a reference, most of the bright coronal lines get stronger in SC24 and, by contrast, those from the chromosphere and transition region have less variability in SC24. We therefore suggest that, the empirical relation between solar EUV and P, which is derived from observations in previous solar cycles, may not adapt to SC24. The changes in EUV spectrum need to be considered in the models for aeronomic study, especially those using F10.7 index as an input parameter.

  2. Capillary discharge extreme ultraviolet lasers. [Colorado State Univ. , Ft. Collins

    SciTech Connect

    Rocca, J.J.

    1992-08-01

    The project objective is to explore the generation of soft X-ray laser radiation in a plasma column created by a fast capillary discharge. The proposed capillary lasing scheme offers the potential for compact, simple and efficient soft X-ray laser sources. For this purpose a compact, fast pulse generator which produces 100 kA current pulses with a risetime of 11 ns was constructed. Initial experiments were conducted in evacuated capillaries, in which the plasma is produced by ablation of the capillary walls. The soft X-ray emission from discharges in polyethylene capillary channels was studied to investigate the possibility of amplification in the 3-2 transition of C VI, at {lambda} = 18.2 nm. Time-resolved spectra in which this transition appears anomalously intense with respect to the 4--2 transition of the same ion were obtained. To date, however, this phenomenoa could not be confirmed as gain, as the intensity of the 18.2 nm line has not been observed to increase exponentially as a function of the capillary length. Encouraging results were obtained by fast pulse discharge excitation of capillaries filled with preionized gas. High temperature (Te > 150 eV), small diameter ({approximately}200 {mu}m) plasma columns were efficiently generated. Fast current pulse excitation of a selected low mass density of uniformly preionized material Mag the capillary was observed to detach rapidly the plasma from the capillary walls, and form a plasma channel of a diameter much smaller and significantly hotter than those produced by a similar current pulse in evacuated capillaries of the same size. Discharges in argon-filled capillaries at currents between 20 and 60 kA produced plasmas with ArX-Ar{sub XIV} line emission, and with spectra that are similar to those of plasmas generated by > I MA current implosions in large pulsed power machines. The characteristic of these plasmas approach those necessary for soft X-ray amplification in low Z elements.

  3. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

    DOEpatents

    Kubiak, Glenn D.; Bernardez, II, Luis J.

    2000-01-04

    A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

  4. [Characteristics of extreme ultraviolet emission from tin plasma using CO2 laser for lithography].

    PubMed

    Wu, Tao; Wang, Xin-Bing; Wang, Shao-Yi; Lu, Pei-Xiang

    2012-07-01

    The extreme ultraviolet (EUV) emission characteristics from Sn plasma for lithography produced by a pulse discharge CO2 laser was investigated under different conditions. Extreme ultraviolet spectral measurements were made throughout the wavelength region of 6.5 nm to 16.8 nm using a grazing incidence flat-field spectrograph coupled with an X-ray charge-coupled device camera for detection of time-integrated spectra. The dependence of spectral properties of the EUV emission on pulse duration, incidence pulse energy, and buffer gas pressure was investigated. The results show that the peak of EUV spectra was located at 13.5 nm. The intensity of EUV emission increased with increasing laser energy ranging from 30 mJ to 600 mJ in a nonlinear manner with saturation effect. The critical energy of incident pulse laser for the generation of EUV emission is near 30 mJ in our experiment. The highest conversion efficiency of 1.2% in producing 13.5 nm EUV light with 0.27 nm bandwidth was achieved at pump energy of 425 mJ. The EUV spectra from a plate target produced by laser pulse with full width at half maximum range from 50 ns to 120 ns were recorded and negligible differences in their spectral features noticed even though higher spectral intensity was observed by shorter pulse duration. The 2% in-band EUV intensity with 52 ns pulse duration was 1.6 times higher than that with 120 ns pulse duration due to the increase in laser intensity. It was also found that the detected EUV spectral intensity rapidly decreased with increasing buffer air pressure, and the EUV emission could be totally absorbed at the pressure of 200 Pa, while weak EUV emission could be still detected at the buffer He gas pressure of 7 x 10(4) Pa. The experimental results showed that the absorption coefficient of 13.5 nm light at air buffer gas pressure of 100 Pa was 3.0 m(-1), while the absorption coefficient was 0.96 m(-1) at the same He buffer gas pressure.

  5. Real-time and sub-wavelength ultrafast coherent diffraction imaging in the extreme ultraviolet.

    PubMed

    Zürch, M; Rothhardt, J; Hädrich, S; Demmler, S; Krebs, M; Limpert, J; Tünnermann, A; Guggenmos, A; Kleineberg, U; Spielmann, C

    2014-12-08

    Coherent Diffraction Imaging is a technique to study matter with nanometer-scale spatial resolution based on coherent illumination of the sample with hard X-ray, soft X-ray or extreme ultraviolet light delivered from synchrotrons or more recently X-ray Free-Electron Lasers. This robust technique simultaneously allows quantitative amplitude and phase contrast imaging. Laser-driven high harmonic generation XUV-sources allow table-top realizations. However, the low conversion efficiency of lab-based sources imposes either a large scale laser system or long exposure times, preventing many applications. Here we present a lensless imaging experiment combining a high numerical aperture (NA = 0.8) setup with a high average power fibre laser driven high harmonic source. The high flux and narrow-band harmonic line at 33.2 nm enables either sub-wavelength spatial resolution close to the Abbe limit (Δr = 0.8λ) for long exposure time, or sub-70 nm imaging in less than one second. The unprecedented high spatial resolution, compactness of the setup together with the real-time capability paves the way for a plethora of applications in fundamental and life sciences.

  6. Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography

    SciTech Connect

    Namba, S.; Fujioka, S.; Nishimura, H.; Yasuda, Y.; Nagai, K.; Miyanaga, N.; Izawa, Y.; Mima, K.; Takiyama, K.

    2006-04-24

    An experimental study was made of a target consisting of the minimum mass of pure tin (Sn) necessary for the highest conversion to extreme ultraviolet (EUV) light while minimizing the generation of plasma debris. The minimum-mass target comprised a thin Sn layer coated on a plastic shell and was irradiated with a Nd:YAG laser pulse. The expansion behavior of neutral atoms and singly charged ions emanating from the Sn plasma were investigated by spatially resolved visible spectroscopy. A remarkable reduction of debris emission in the backward direction with respect to the incident laser beam was demonstrated with a decrease in the thickness of the Sn layer. The optimal thickness of the Sn layer for a laser pulse of 9 ns at 7x10{sup 10} W/cm{sup 2} was found to be 40 nm, at which low-debris emission in the backward direction and a high conversion to 13.5 nm EUV radiation were simultaneously attained.

  7. Chang'e-3 Extreme Ultraviolet Camera Observations of the Dynamics of the Earth's Plasmasphere

    NASA Astrophysics Data System (ADS)

    Fok, M. C. H.; Zhang, X.; He, F.; Chen, B.; Wang, H. N.; Shen, C.; Ping, J.; Nakano, S.

    2015-12-01

    The Moon-based Extreme Ultraviolet Camera (EUVC) aboard China's Chang'e-3 (CE-3) lunar lander has successfully imaged the global plasmasphere on the Moon for the first time through detecting the resonantly scattered sunlight by plasmaspheric He+ at 30.4 nm with a spatial resolution of 0.1 RE and a time resolution of 10 min. The characteristics and the analyzing methods of the EUVC images are introduced in detail in this report. The plasmapause locations on the magnetic equator are reconstructed with the Minimum L Algorithm and are quantitatively compared with those extracted from in-situ observations by DMSP, THEMIS, and RBSP satellites. Then the plasmapause evolutions during substorms on February 21 2014 and April 21 2014 are investigated. It is found that the evolutions of plasmapause correlate well in both universal time and magnetic local time with the equatorial boundaries of auroral oval during substorms. During these two cases, the solar-wind-driven convection and the geomagnetic activity are relatively weak and steady, and the plasmapause motions can reliably be attributed to the substorms. It is proposed that correlations between the auroral signatures and the plasmapause motions may be due to the generation and Earthward-propagation of dipolarization front and resultant pitch angle scattering. In future work, we will search more in-situ and remote sensing data in both the plasmasphere and the magnetotail regions to investigate the correlations between the plasmaspheric erosions, the dipolarization fronts, and the energetic ions injections.

  8. Optical proximity correction for extreme ultra-violet mask with pellicle

    NASA Astrophysics Data System (ADS)

    Mo, Soo-Yeon; Kim, In-Seon; Oh, Hye-Keun

    2015-10-01

    Extreme ultraviolet (EUV) lithography is considered as one of the viable solutions for production of the next generation integrated devices. EUV mask defect control becomes more critical issue in order to sustain the quality of wafer fabrication process. Since pellicle is the essential component to prevent patterning deformations caused by particle defects on EUV mask[1-2], EUV OPC (optical proximity correction) that takes into account for pellicle effects on imaging quality is required for achieving better pattern fidelity and critical dimension control. In this study, image blurring effect induced by the EUV mask pellicle on mask pattern structures was investigated and it was found that the localized short-range OPC using commercial software performed as desired considering transmission intensity loss due to pellicle. For experiment, edge placement error differences of the same 2D logic patterns with 16 nm half pitch with and without pellicle were compared. Finally, a method was suggested how patterning throughput loss caused by the transmission loss can be compensated by EUV OPC, which may allow pellicle transmission even below 90%.

  9. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

    SciTech Connect

    Benk, Markus P.; Wojdyla, Antoine; Chao, Weilun; Salmassi, Farhad H.; Oh, Sharon R.; Wang, Yow-Gwo; Miyakawa, Ryan H.; Naulleau, Patrick P.; Goldberg, Kenneth A.

    2016-07-12

    The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’s Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.

  10. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.

    PubMed

    Ashby, Paul D; Olynick, Deirdre L; Ogletree, D Frank; Naulleau, Patrick P

    2015-10-14

    Extreme ultraviolet lithography (EUVL) is the leading technology for enabling miniaturization of computational components over the next decade. Next-generation resists will need to meet demanding performance criteria of 10 nm critical dimension, 1.2 nm line-edge roughness, and 20 mJ cm(-2) exposure dose. Here, the current state of the development of EUV resist materials is reviewed. First, pattern formation in resist materials is described and the Hansen solubility sphere (HSS) is used as a framework for understanding the pattern-development process. Then, recent progress in EUVL resist chemistry and characterization is discussed. Incremental advances are obtained by transferring chemically amplified resist materials developed for 193 nm lithography to EUV wavelengths. Significant advances will result from synthesizing high-absorbance resist materials using heavier atoms. In the framework of the HSS model, these materials have significant room for improvement and thus offer great promise as high-performance EUV resists for patterning of sub-10 nm features. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  11. Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology

    NASA Astrophysics Data System (ADS)

    Vinokhodov, A. Yu.; Krivokorytov, M. S.; Sidelnikov, Yu. V.; Krivtsun, V. M.; Medvedev, V. V.; Koshelev, K. N.

    2016-10-01

    We report on the development of a high brightness source of extreme ultraviolet radiation (EUV) with a working wavelength of 13.5 nm. The source is based on a laser-produced plasma driven by pulsed radiation of a Nd:YAG laser system. Liquid droplets of Sn-In eutectic alloy were used as the source fuel. The droplets were created by a droplet generator operating in the jet break-up regime. The EUV emission properties of the plasma, including the emission spectrum, time profile, and conversion efficiency of laser radiation into useful 13.5 nm photons, have been characterized. Using the shadowgraphy technique, we demonstrated the production of corpuscular debris by the plasma source and the influence of the plasma on the neighboring droplet targets. The high-frequency laser operation was simulated by usage of the dual pulse regime. Based on the experimental results, we discuss the physical phenomena that could affect the source operation at high repetition rates. Finally, we estimate that an average source brightness of 1.2 kW/mm2 sr is feasible at a high repetition rate.

  12. Analysis and control of thin film stresses during extreme ultraviolet lithography mask blank fabrication

    NASA Astrophysics Data System (ADS)

    Zheng, Liang

    2010-11-01

    Extreme Ultraviolet Lithography (EUVL) is the leading candidate for Next-Generation Lithography (NGL) in the sub-45 nm regime. One of the critical technical problems to be solved before the commercialization of EUVL is the control of image placement errors during EUVL mask blank fabrication. This paper focuses on the characterization of image placement errors induced by the thin film stresses during EUVL mask blank fabrication. Firstly, the causes and classifications of the stresses in the thin films were discussed. Then an analytical analysis was developed to reveal the effects of the thin film stresses on the distortions of the EUVL mask. Lastly, finite element (FE) models were established to simulate each process step in EUVL mask blank fabrication. The out-of-plane distortions (OPD) and inplane distortions (IPD) were tracked for each process step. The numerical results are compared with the analytical results to validate the FE models. Comparison indicated that numerical results and theoretical results agree very well with each other. The research in this paper provides a solid support for EUVL mask blank fabrication, theoretically and numerically. Further mounting and chucking procedures can keep image placement errors within the allotted error budget as well as provide the necessary flatness.

  13. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

    NASA Astrophysics Data System (ADS)

    Benk, Markus P.; Wojdyla, Antoine; Chao, Weilun; Salmassi, Farhad; Oh, Sharon; Wang, Yow-Gwo; Miyakawa, Ryan H.; Naulleau, Patrick P.; Goldberg, Kenneth A.

    2016-07-01

    The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP's Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. The anamorphic images show the same image quality in the horizontal and vertical directions.

  14. Real-time and Sub-wavelength Ultrafast Coherent Diffraction Imaging in the Extreme Ultraviolet

    PubMed Central

    Zürch, M.; Rothhardt, J.; Hädrich, S.; Demmler, S.; Krebs, M.; Limpert, J.; Tünnermann, A.; Guggenmos, A.; Kleineberg, U.; Spielmann, C.

    2014-01-01

    Coherent Diffraction Imaging is a technique to study matter with nanometer-scale spatial resolution based on coherent illumination of the sample with hard X-ray, soft X-ray or extreme ultraviolet light delivered from synchrotrons or more recently X-ray Free-Electron Lasers. This robust technique simultaneously allows quantitative amplitude and phase contrast imaging. Laser-driven high harmonic generation XUV-sources allow table-top realizations. However, the low conversion efficiency of lab-based sources imposes either a large scale laser system or long exposure times, preventing many applications. Here we present a lensless imaging experiment combining a high numerical aperture (NA = 0.8) setup with a high average power fibre laser driven high harmonic source. The high flux and narrow-band harmonic line at 33.2 nm enables either sub-wavelength spatial resolution close to the Abbe limit (Δr = 0.8λ) for long exposure time, or sub-70 nm imaging in less than one second. The unprecedented high spatial resolution, compactness of the setup together with the real-time capability paves the way for a plethora of applications in fundamental and life sciences. PMID:25483626

  15. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

    DOE PAGES

    Benk, Markus P.; Wojdyla, Antoine; Chao, Weilun; ...

    2016-07-12

    The SHARP high-numerical aperture actinic reticle review project is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP emulates the illumination and imaging conditions of current EUV lithography scanners and those several generations into the future. An anamorphic imaging optic with increased mask-side numerical aperture (NA) in the horizontal and increased demagnification in the vertical direction has been proposed in this paper to overcome limitations of current multilayer coatings and extend EUV lithography beyond 0.33 NA. Zoneplate lenses with an anamorphic 4×/8× NA of 0.55 are fabricated and installed in the SHARP microscope to emulate anamorphic imaging. SHARP’smore » Fourier synthesis illuminator with a range of angles exceeding the collected solid angle of the newly designed elliptical zoneplates can produce arbitrary angular source spectra matched to anamorphic imaging. A target with anamorphic dense features down to 50-nm critical dimension is fabricated using 40 nm of nickel as the absorber. In a demonstration experiment, anamorphic imaging at 0.55 4×/8× NA and 6 deg central ray angle (CRA) is compared with conventional imaging at 0.5 4× NA and 8 deg CRA. A significant contrast loss in horizontal features is observed in the conventional images. Finally, the anamorphic images show the same image quality in the horizontal and vertical directions.« less

  16. Plasma dynamics of a confined extreme ultraviolet light source

    SciTech Connect

    Yeates, P.; Kennedy, E. T.

    2010-09-15

    Laser plasmas were generated by ablation of aluminum targets via a Nd:YAG glass laser, of pulse energy 0.8 J, and duration 15 ns (full width at half maximum) at the fundamental wavelength (1.064 {mu}m). Emission lines in the wavelength range of 27-32 nm (45-37.8 eV) were mapped over a spatial range extending out 1.8 mm from the target surface and for a temporal range of 42 ns after the termination of the laser pulse. Two targets were utilized: a planar surface and a rectangular cavity. The latter was composed of a rectangular shaped cavity of depth 3 mm and height 1.2 mm, cut into an aluminum massive. An irradiance of I{sub p{approx}}10{sup 11} W/cm{sup 2} was delivered to both targets and the confining influence of the rectangular cavity upon plasma formation and expansion was studied. Diagnostics of the emitted spectra reveal the unique dynamics of restricted plasma plume expansion, which results in plasma-surface collisions and subsequent plasma rebound within the cavity. These effects give rise to strong enhancement of both continuum and line emission in the contained plasma plume. These enhancements are especially evident for the more highly charged ions. Superior emission from plasma-surface collisions are associated with ''forced recombination'' during early time scales, while enhanced emission at later stages are associated with plasma plume component rebound and collision.

  17. A PSF equalization technique for the Multi-Order Solar Extreme-ultraviolet Spectrograph (MOSES)

    NASA Astrophysics Data System (ADS)

    Atwood, Shane; Kankelborg, Charles

    2015-10-01

    The Multi-Order Solar Extreme Ultraviolet Spectrograph (MOSES) is a rocket-borne slitless imaging spectrometer, designed to observe He II (30.4 nm) emission in the solar transition region. This instrument forms three simultaneous images at spectral orders m=-1, 0, +1 over an extended field of view (FOV). A multi-layer coating on the grating and thin film filters in front of the detectors defines the instrument passband. Each image contains a unique combination of spectral and spatial information. Our overarching goal in analyzing these data is to estimate a spectral line profile at every point in the FOV. Each spectral order has different image geometry, and therefore different aberrations. Since the point spread function (PSF) differs between any two images, systematic errors are introduced when we use all three images together to invert for spectral line profiles. To combat this source of systematic error, we have developed a PSF equalization scheme. Determination of the image PSFs is impractical for several reasons, including changes that may occur due to vibration during both launch and recovery operations. We have therefore developed a strategy using only the solar images obtained during flight to generate digital filters that modify each image so that they have the same effective PSF. Generation of the PSF equalization filters does not require that the PSFs themselves be known. Our approach begins with the assumption that there are only two things that cause the power spectra of our images to differ: (1) aberrations; and (2) the FOV average spectral line profile, which is known in principle from an abundance of historical data. To validate our technique, we generate three synthetic images with three different PSFs. We compare PSF equalizations performed without knowledge of the PSF to corrections performed with that knowledge. Finally, we apply PSF equalization to solar images obtained in the 2006 MOSES flight and demonstrate the removal of artifacts.

  18. Tabletop single-shot extreme ultraviolet Fourier transform holography of an extended object.

    PubMed

    Malm, Erik B; Monserud, Nils C; Brown, Christopher G; Wachulak, Przemyslaw W; Xu, Huiwen; Balakrishnan, Ganesh; Chao, Weilun; Anderson, Erik; Marconi, Mario C

    2013-04-22

    We demonstrate single and multi-shot Fourier transform holography with the use of a tabletop extreme ultraviolet laser. The reference wave was produced by a Fresnel zone plate with a central opening that allowed the incident beam to illuminate the sample directly. The high reference wave intensity allows for larger objects to be imaged compared to mask-based lensless Fourier transform holography techniques. We obtain a spatial resolution of 169 nm from a single laser pulse and a resolution of 128 nm from an accumulation of 20 laser pulses for an object ~11x11μm(2) in size. This experiment utilized a tabletop extreme ultraviolet laser that produces a highly coherent ~1.2 ns laser pulse at 46.9 nm wavelength.

  19. High-resolution time-resolved extreme ultraviolet spectroscopy on NSTX.

    PubMed

    Lepson, J K; Beiersdorfer, P; Clementson, J; Bitter, M; Hill, K W; Kaita, R; Skinner, C H; Roquemore, A L; Zimmer, G

    2012-10-01

    We report on upgrades to the flat-field grazing-incidence grating spectrometers X-ray and Extreme Ultraviolet Spectrometer (XEUS) and Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS), at the National Spherical Torus Experiment (NSTX) at the Princeton Plasma Physics Laboratory. XEUS employs a variable space grating with an average spacing of 2400 lines/mm and covers the 9-64 Å wavelength band, while LoWEUS has an average spacing of 1200 lines/mm and is positioned to monitor the 90-270 Å wavelength band. Both spectrometers have been upgraded with new cameras that achieve 12.5 ms time resolution. We demonstrate the new time resolution capability by showing the time evolution of iron in the NSTX plasma.

  20. Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

    SciTech Connect

    Oyama, Tomoko Gowa; Oshima, Akihiro; Tagawa, Seiichi

    2016-08-15

    It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, we calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).

  1. Calibration of a microchannel plate based extreme ultraviolet grazing incident spectrometer at the Advanced Light Source

    SciTech Connect

    Bakeman, M. S.; Tilborg, J. van; Sokollik, T.; Baum, D.; Ybarrolaza, N.; Duarte, R.; Toth, C.; Leemans, W. P.

    2010-10-15

    We present the design and calibration of a microchannel plate based extreme ultraviolet spectrometer. Calibration was performed at the Advance Light Source (ALS) at the Lawrence Berkeley National Laboratory (LBNL). This spectrometer will be used to record the single shot spectrum of radiation emitted by the tapered hybrid undulator (THUNDER) undulator installed at the LOASIS GeV-class laser-plasma-accelerator. The spectrometer uses an aberration-corrected concave grating with 1200 lines/mm covering 11-62 nm and a microchannel plate detector with a CsI coated photocathode for increased quantum efficiency in the extreme ultraviolet. A touch screen interface controls the grating angle, aperture size, and placement of the detector in vacuum, allowing for high-resolution measurements over the entire spectral range.

  2. Investigations on the emission in the extreme ultraviolet of a pseudospark based discharge light source

    NASA Astrophysics Data System (ADS)

    Bergmann, Klaus; Vieker, Jochen; von Wezyk, Alexander

    2016-10-01

    A new concept of a discharge based extreme ultraviolet radiation source is presented. This concept is based on an electrode system that consists of two consecutive pseudospark discharge stages. The first stage is used to create a pinch plasma as emitter in the extreme ultraviolet and soft X-ray range and the second stage is used as a high current switch between the storage capacity and the first stage. First results on the emission characteristics for the working gases nitrogen, krypton, and xenon, with focus on the emission at 2.88 nm, 6-7 nm, and around 13.5 nm, respectively, are disclosed under the aspect of the access to a larger discharge parameter range. It is shown that this increased range opens a path to a higher spectral peak brightness.

  3. Calibration of a microchannel plate based extreme ultraviolet grazing incident spectrometer at the Advanced Light Source.

    PubMed

    Bakeman, M S; van Tilborg, J; Sokollik, T; Baum, D; Ybarrolaza, N; Duarte, R; Toth, C; Leemans, W P

    2010-10-01

    We present the design and calibration of a microchannel plate based extreme ultraviolet spectrometer. Calibration was performed at the Advance Light Source (ALS) at the Lawrence Berkeley National Laboratory (LBNL). This spectrometer will be used to record the single shot spectrum of radiation emitted by the tapered hybrid undulator (THUNDER) undulator installed at the LOASIS GeV-class laser-plasma-accelerator. The spectrometer uses an aberration-corrected concave grating with 1200 lines/mm covering 11-62 nm and a microchannel plate detector with a CsI coated photocathode for increased quantum efficiency in the extreme ultraviolet. A touch screen interface controls the grating angle, aperture size, and placement of the detector in vacuum, allowing for high-resolution measurements over the entire spectral range.

  4. The Third Extreme Ultraviolet Explorer Right Angle Program Catalog: The Last Years

    NASA Astrophysics Data System (ADS)

    Christian, Damian J.

    2002-12-01

    We present 63 new extreme-ultraviolet sources from observations taken during the Right Angle Program (RAP) of the Extreme Ultraviolet Explorer (EUVE). This paper concentrates on data taken in the last years of the RAP, 1999 and 2000, with a sky coverage of 7%. We present sample light curves for several sources, including flare detections from the previously uncataloged source EUVE J0613-23.9B, the active late-type star EUVE J0728-20.9 (V372 Pup), and the cataclysmic variable EUVE J0332-25.9 (VY For). This final RAP catalog, combined with the EUVE all-sky survey, Lampton et al. faint list, and previous RAP catalogs, brings the total number of EUVE sources to nearly 1200.

  5. Extreme ultraviolet observations of G191-B2B and the local interstellar medium with the Hopkins Ultraviolet Telescope

    NASA Technical Reports Server (NTRS)

    Kimble, Randy A.; Davidsen, Arthur F.; Blair, William P.; Bowers, Charles W.; Van Dyke Dixon, W.; Durrance, Samuel T.; Feldman, Paul D.; Ferguson, Henry C.; Henry, Richard C.; Kriss, Gerard A.

    1993-01-01

    During the Astro-l mission in 1990 December, the Hopkins Ultraviolet Telescope (HUT) was used to observe the extreme ultraviolet spectrum (415-912 A) of the hot DA white dwarf GI91-B2B. Absorption by neutral helium shortward of the 504 A He I absorption edge is clearly detected in the raw spectrum. Model fits to the observed spectrum require interstellar neutral helium and neutral hydrogen column densities of 1.45 +/- 0.065 x 10 exp 17/sq cm and 1.69 +/- 0.12 x 10 exp 18/sq cm, respectively. Comparison of the neutral columns yields a direct assessment of the ionization state of the local interstellar cloud surrounding the Sun. The neutral hydrogen to helium ratio of 11.6 +/- 1.0 observed by HUT strongly contradicts the widespread view that hydrogen is much more ionized than helium in the local interstellar medium, a view which has motivated some exotic theoretical explanations for the supposed high ionization.

  6. Extreme ultraviolet marking system for anti-counterfeiting tags with adjustable security level

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2012-01-01

    We present a recently patented apparatus which consists of an extreme ultraviolet radiation source writing invisible patterns on thin tags of alkali halides. The tags patterned using this method are almost impossible to counterfeit, and offer a much better protection against fakes than available anti-counterfeiting techniques. We will discuss if this novel technology is ready for industrial production of anti-counterfeiting tags.

  7. The filters for the Extreme Ultraviolet Explorer - Calibration and lifetesting results

    NASA Technical Reports Server (NTRS)

    Vedder, P. W.; Vallerga, J. V.; Siegmund, O. H. W.; Gibson, J.; Hull, J.

    1989-01-01

    The results of the transmission calibrations of the seven sets of flight integration filters for the Extreme Ultraviolet Explorer (EUVE) satellite are presented. The Berkely EUV Calibration Facility was used to determine absolute transmissions over six orders of magnitue at 28 wavelengths. A lifetesting program designed to monitor changes in the transmission and mechanical properties of the EUVE filters over the lifetime of the mission is described.

  8. Transmission grating based extreme ultraviolet imaging spectrometer for time and space resolved impurity measurements.

    PubMed

    Kumar, Deepak; Stutman, Dan; Tritz, Kevin; Finkenthal, Michael; Tarrio, Charles; Grantham, Steven

    2010-10-01

    A free standing transmission grating based imaging spectrometer in the extreme ultraviolet range has been developed for the National Spherical Torus Experiment (NSTX). The spectrometer operates in a survey mode covering the approximate spectral range from 30 to 700 Å and has a resolving capability of δλ/λ on the order of 3%. Initial results from space resolved impurity measurements from NSTX are described in this paper.

  9. Bright subcycle extreme ultraviolet bursts from a single dense relativistic electron sheet.

    PubMed

    Ma, W J; Bin, J H; Wang, H Y; Yeung, M; Kreuzer, C; Streeter, M; Foster, P S; Cousens, S; Kiefer, D; Dromey, B; Yan, X Q; Meyer-ter-Vehn, J; Zepf, M; Schreiber, J

    2014-12-05

    Double-foil targets separated by a low density plasma and irradiated by a petawatt-class laser are shown to be a copious source of coherent broadband radiation. Simulations show that a dense sheet of relativistic electrons is formed during the interaction of the laser with the tenuous plasma between the two foils. The coherent motion of the electron sheet as it transits the second foil results in strong broadband emission in the extreme ultraviolet, consistent with our experimental observations.

  10. Extreme Ultraviolet Imaging of Electron Heated Targets in Petawatt Laser Experiments

    SciTech Connect

    Ma, T; MacPhee, A; Key, M; Akli, K; Mackinnon, A; Chen, C; Barbee, T; Freeman, R; King, J; Link, A; Offermann, D; Ovchinnikov, V; Patel, P; Stephens, R; VanWoerkom, L; Zhang, B; Beg, F

    2007-11-29

    The study of the transport of electrons, and the flow of energy into a solid target or dense plasma, is instrumental in the development of fast ignition inertial confinement fusion. An extreme ultraviolet (XUV) imaging diagnostic at 256 eV and 68 eV provides information about heating and energy deposition within petawatt laser-irradiated targets. XUV images of several irradiated solid targets are presented.

  11. High-resolution extreme-ultraviolet spectroscopy of potassium using anti-Stokes radiation

    NASA Technical Reports Server (NTRS)

    Rothenberg, J. E.; Young, J. F.; Harris, S. E.

    1981-01-01

    The use of a new extreme-ultraviolet radiation source based on spontaneous anti-Stokes scattering for high-resolution absorption spectroscopy of transition originating from the 3p6 shell of potassium is reported. The region from 546.6 to 536.8 A is scanned at a resolution of about 1.2 Kayser. Within this region, four previously unreported lines are observed.

  12. Imaging in Nanoscale Using Laser-Plasma Sources of Extreme Ultraviolet (EUV)

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Bartnik, A.; Baranowska-Korczyc, A.; Pánek, D.; Brůža, P.; Kostecki, J.; Węgrzyński, Ł.; Jarocki, R.; Szczurek, M.; Fronc, K.; Elbaum, D.; Fiedorowicz, H.

    New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy, based on Fresnel zone plates. In this paper, we report on applications of a desk-top microscopy using a laser-plasma EUV source based on a gas-puff target for studies of morphology of thin silicon membranes coated with NaCl crystals and samples composed of ZnO nanofibers.

  13. Extreme ultraviolet and X-ray spectroheliograph for OSO-H

    NASA Technical Reports Server (NTRS)

    Sterk, A. A.; Kieser, F.; Peck, S.; Knox, E.

    1972-01-01

    A complex scientific instrument was designed, fabricated, tested, and calibrated for launch onboard OSO-H. This instrument consisted of four spectroheliographs and an X-ray polarimeter. The instrument is designed to study solar radiation at selected wavelengths in the X-ray and the extreme ultraviolet ranges, make observations at the H-alpha wavelength, and measure the degree of polarization of X-ray emissions.

  14. A NOISE ADAPTIVE FUZZY EQUALIZATION METHOD FOR PROCESSING SOLAR EXTREME ULTRAVIOLET IMAGES

    SciTech Connect

    Druckmueller, M.

    2013-08-15

    A new image enhancement tool ideally suited for the visualization of fine structures in extreme ultraviolet images of the corona is presented in this paper. The Noise Adaptive Fuzzy Equalization method is particularly suited for the exceptionally high dynamic range images from the Atmospheric Imaging Assembly instrument on the Solar Dynamics Observatory. This method produces artifact-free images and gives significantly better results than methods based on convolution or Fourier transform which are often used for that purpose.

  15. Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources

    SciTech Connect

    Masnavi, Majid; Nakajima, Mitsuo; Hotta, Eiki; Horioka, Kazuhiko; Niimi, Gohta; Sasaki, Akira

    2007-02-01

    Extreme ultraviolet (EUV) discharge-based lamps for EUV lithography need to generate extremely high power in the narrow spectrum band of 13.5{+-}0.135 nm. A simplified collisional-radiative model and radiative transfer solution for an isotropic medium were utilized to investigate the wavelength-integrated light outputs in tin (Sn) plasma. Detailed calculations using the Hebrew University-Lawrence Livermore atomic code were employed for determination of necessary atomic data of the Sn{sup 4+} to Sn{sup 13+} charge states. The result of model is compared with experimental spectra from a Sn-based discharge-produced plasma. The analysis reveals that considerably larger efficiency compared to the so-called efficiency of a black-body radiator is formed for the electron density {approx_equal}10{sup 18} cm{sup -3}. For higher electron density, the spectral efficiency of Sn plasma reduces due to the saturation of resonance transitions.

  16. Spectroscopy of Highly Charged Tin Ions for AN Extreme Ultraviolet Light Source for Lithography

    NASA Astrophysics Data System (ADS)

    Torretti, Francesco; Windberger, Alexander; Ubachs, Wim; Hoekstra, Ronnie; Versolato, Oscar; Ryabtsev, Alexander; Borschevsky, Anastasia; Berengut, Julian; Crespo Lopez-Urrutia, Jose

    2017-06-01

    Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) light around 13.5 nm in nanolithographic applications. This light is generated primarily by atomic transitions in highly charged tin ions: Sn^{8+}-Sn^{14+}. Due to the electronic configurations of these charge states, thousands of atomic lines emit around 13.5 nm, clustered in a so-called unresolved transition array. As a result, accurate line identification becomes difficult in this regime. Nevertheless, this issue can be circumvented if one turns to the optical: with far fewer atomic states, only tens of transitions take place and the spectra can be resolved with far more ease. We have investigated optical emission lines in an electron-beam-ion-trap (EBIT), where we managed to charge-state resolve the spectra. Based on this technique and on a number of different ab initio techniques for calculating the level structure, the optical spectra could be assigned [1,2]. As a conclusion the assignments of EUV transitions in the literature require corrections. The EUV and optical spectra are measured simultaneously in the controlled conditions of the EBIT as well as in a droplet-based laser-produced plasma source providing information on the contribution of Sn^{q+} charge states to the EUV emission. [1] A. Windberger, F. Torretti, A. Borschevsky, A. Ryabtsev, S. Dobrodey, H. Bekker, E. Eliav, U. Kaldor, W. Ubachs, R. Hoekstra, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Analysis of the fine structure of Sn^{11+} - Sn^{14+} ions by optical spectroscopy in an electron beam ion trap, Phys. Rev. A 94, 012506 (2016). [2] F. Torretti, A. Windberger, A. Ryabtsev, S. Dobrodey, H. Bekker, W. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Optical spectroscopy of complex open 4d-shell ions Sn^{7+} - Sn^{10+}, arXiv:1612.00747

  17. The extreme ultraviolet imager of solar orbiter: optical design and alignment scheme

    NASA Astrophysics Data System (ADS)

    Halain, J.-P.; Mazzoli, A.; Meining, S.; Rochus, P.; Renotte, E.; Auchère, F.; Schühle, U.; Delmotte, F.; Dumesnil, C.; Philippon, A.; Mercier, R.; Hermans, A.

    2015-09-01

    The Extreme Ultraviolet Imager (EUI) is one of the remote sensing instruments on-board the Solar Orbiter mission. It will provide dual-band full-Sun images of the solar corona in the extreme ultraviolet (17.1 nm and 30.4 nm), and high resolution images of the solar disk in both extreme ultraviolet (17.1 nm) and vacuum ultraviolet (Lyman-alpha 121.6 nm). The EUI optical design takes heritage of previous similar instruments. The Full Sun Imager (FSI) channel is a single mirror Herschel design telescope. The two High Resolution Imager (HRI) channels are based on a two-mirror optical refractive scheme, one Ritchey-Chretien and one Gregory optical design for the EUV and the Lyman-alpha channels, respectively. The spectral performances of the EUI channels are obtained thanks to dedicated mirror multilayer coatings and specific band-pass filters. The FSI channel uses a dual-band mirror coating combined with aluminum and zirconium band-pass filters. The HRI channels use optimized band-pass selection mirror coatings combined with aluminum band-pass filters and narrow band interference filters for Lyman-alpha. The optical performances result from accurate mirror manufacturing tolerances and from a two-step alignment procedure. The primary mirrors are first co-aligned. The HRI secondary mirrors and focal planes positions are then adjusted to have an optimum interferometric cavity in each of these two channels. For that purpose a dedicated alignment test setup has been prepared, composed of a dummy focal plane assembly representing the detector position. Before the alignment on the flight optical bench, the overall alignment method has been validated on the Structural and Thermal Model, on a dummy bench using flight spare optics, then on the Qualification Model to be used for the system verification test and qualifications.

  18. Multi-spectral solar telescope array IV; The soft x-ray and extreme ultraviolet filters

    SciTech Connect

    Lindblom, J.F.; O'Neal, R.H.; Walker, A.B.C. Jr. ); Powell, F.R. ); Barbee, T.W. Jr. ); Hoover, R.B. ); Powell, S.F. )

    1991-08-01

    The multilayer mirrors used in the normal-incidence optical systems of the Multi-Spectral Solar Telescope Array (MSSTA) are efficient reflectors for soft x-ray/extreme ultraviolet (EUV) radiation at wavelengths that satisfy the Bragg condition, thus allowing a narrow band of the soft x-ray/EUV spectrum to be isolated. However, these same mirrors are also excellent reflectors in the visible, ultraviolet, and far-ultraviolet (FUV) part of the spectrum, where normal incidence reflectivities can exceed 50%. Furthermore, the sun emits far more radiation in the ultraviolet and visible part of the spectrum than it does in the soft x-ray/EUV. For this reason, thin foil filters are employed to eliminate the unwanted longer wavelength solar emission. The MSSTA instrument uses various combinations of thin foil filters composed of aluminum carbon, tellurium, potassium bromide, beryllium, molybdenum, rhodium, and phthalocyanine to achieve the desired radiation rejection characteristics. In this paper, the authors discuss issues concerning the design, manufacture, and predicted performance of MSSTA filters.

  19. Absolute intensity calibration of the Wendelstein 7-X high efficiency extreme ultraviolet overview spectrometer system

    NASA Astrophysics Data System (ADS)

    Greiche, Albert; Biel, Wolfgang; Marchuk, Oleksandr; Burhenn, Rainer

    2008-09-01

    The new high effiency extreme ultraviolet overview spectrometer (HEXOS) system for the stellarator Wendelstein 7-X is now mounted for testing and adjustment at the tokamak experiment for technology oriented research (TEXTOR). One part of the testing phase was the intensity calibration of the two double spectrometers which in total cover a spectral range from 2.5 to 160.0 nm with overlap. This work presents the current intensity calibration curves for HEXOS and describes the method of calibration. The calibration was implemented with calibrated lines of a hollow cathode light source and the branching ratio technique. The hollow cathode light source provides calibrated lines from 16 up to 147 nm. We could extend the calibrated region in the spectrometers down to 2.8 nm by using the branching line pairs emitted by an uncalibrated pinch extreme ultraviolet light source as well as emission lines from boron and carbon in TEXTOR plasmas. In total HEXOS is calibrated from 2.8 up to 147 nm, which covers most of the observable wavelength region. The approximate density of carbon in the range of the minor radius from 18 to 35 cm in a TEXTOR plasma determined by simulating calibrated vacuum ultraviolet emission lines with a transport code was 5.5×1017 m-3 which corresponds to a local carbon concentration of 2%.

  20. The Intrinsic Extreme Ultraviolet Fluxes of F5 V TO M5 V Stars

    NASA Astrophysics Data System (ADS)

    Linsky, Jeffrey L.; Fontenla, Juan; France, Kevin

    2014-01-01

    Extreme ultraviolet (EUV) radiations (10-117 nm) from host stars play important roles in the ionization, heating, and mass loss from exoplanet atmospheres. Together with the host star's Lyα and far-UV (117-170 nm) radiation, EUV radiation photodissociates important molecules, thereby changing the chemistry in exoplanet atmospheres. Since stellar EUV fluxes cannot now be measured and interstellar neutral hydrogen completely obscures stellar radiation between 40 and 91.2 nm, even for the nearest stars, we must estimate the unobservable EUV flux by indirect methods. New non-LTE semiempirical models of the solar chromosphere and corona and solar irradiance measurements show that the ratio of EUV flux in a variety of wavelength bands to the Lyα flux varies slowly with the Lyα flux and thus with the magnetic heating rate. This suggests and we confirm that solar EUV/Lyα flux ratios based on the models and observations are similar to the available 10-40 nm flux ratios observed with the Extreme Ultraviolet Explorer (EUVE) satellite and the 91.2-117 nm flux observed with the Far Ultraviolet Spectroscopic Explorer (FUSE) satellite for F5 V-M5 V stars. We provide formulae for predicting EUV flux ratios based on the EUVE and FUSE stellar data and on the solar models, which are essential input for modeling the atmospheres of exoplanets.

  1. The intrinsic extreme ultraviolet fluxes of F5 V to M5 V stars

    SciTech Connect

    Linsky, Jeffrey L.; Fontenla, Juan; France, Kevin E-mail: jfontenla@nwra.com

    2014-01-01

    Extreme ultraviolet (EUV) radiations (10-117 nm) from host stars play important roles in the ionization, heating, and mass loss from exoplanet atmospheres. Together with the host star's Lyα and far-UV (117-170 nm) radiation, EUV radiation photodissociates important molecules, thereby changing the chemistry in exoplanet atmospheres. Since stellar EUV fluxes cannot now be measured and interstellar neutral hydrogen completely obscures stellar radiation between 40 and 91.2 nm, even for the nearest stars, we must estimate the unobservable EUV flux by indirect methods. New non-LTE semiempirical models of the solar chromosphere and corona and solar irradiance measurements show that the ratio of EUV flux in a variety of wavelength bands to the Lyα flux varies slowly with the Lyα flux and thus with the magnetic heating rate. This suggests and we confirm that solar EUV/Lyα flux ratios based on the models and observations are similar to the available 10-40 nm flux ratios observed with the Extreme Ultraviolet Explorer (EUVE) satellite and the 91.2-117 nm flux observed with the Far Ultraviolet Spectroscopic Explorer (FUSE) satellite for F5 V-M5 V stars. We provide formulae for predicting EUV flux ratios based on the EUVE and FUSE stellar data and on the solar models, which are essential input for modeling the atmospheres of exoplanets.

  2. Development of ellipsoidal focusing mirror for soft x-ray and extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Mimura, Hidekazu; Takei, Yoshinori; Saito, Takahiro; Kume, Takehiro; Motoyama, Hiroto; Egawa, Satoru; Takeo, Yoko; Higashi, Takahiro

    2015-08-01

    Mirrors are key devices for creating various systems in optics. Focusing X-ray and extreme ultraviolet (EUV) light requires mirror surfaces with an extremely high accuracy. The figure of an ellipsoidal mirror is obtained by rotating an elliptical profile, and using such a mirror, soft X-ray and EUV light can be focused to dimensions on the order of nanometers without chromatic aberration. Although the theoretical performance of ellipsoidal mirrors is extremely high, the fabrication of an ideal ellipsoidal mirror remains problematic. Based on this background, we have been working to develop a fabrication system for ellipsoidal mirrors. In this proceeding, we briefly introduce the fabrication process and the soft X-ray focusing performance of the ellipsoidal mirror fabricated using the proposed process.

  3. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    NASA Astrophysics Data System (ADS)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-01

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO2 laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  4. Observation of a Quasiperiodic Pulsation in Hard X-Ray, Radio, and Extreme-ultraviolet Wavelengths

    NASA Astrophysics Data System (ADS)

    Kumar, Pankaj; Nakariakov, Valery M.; Cho, Kyung-Suk

    2016-05-01

    We present a multiwavelength analysis of a quasiperiodic pulsation (QPP) observed in the hard X-ray (HXR), radio, and extreme-ultraviolet (EUV) channels during an M1.9 flare that occurred on 2011 September 23-24. The nonthermal HXR emission in 25-50 keV observed by RHESSI shows five distinct impulsive peaks of decaying amplitude with a period of about 3 minutes. A similar QPP was observed in the microwave emission recorded by the Nobeyama Radioheliograph and Polarimeter in the 2, 3.75, 9.4, and 17 GHz channels. Interestingly, the 3-minute QPP was also observed in the metric and decimetric radio frequencies (25-180, 245, 610 MHz) as repetitive type III bursts. Multiwavelength observations from the Solar Dynamics Observatory/Atmospheric Image Assembly, Hinode/SOT, and Solar TErrestrial RElations Observatory/SECCHI suggest a fan-spine topology at the eruption site, associated with the formation of a quasi-circular ribbon during the flare. A small filament was observed below the fan loops before the flare onset. The filament rose slowly and interacted with the ambient field. This behavior was followed by an untwisting motion of the filament. Two different structures of the filament showed an approximately 3-minute periodic alternate rotation in the clockwise and counterclockwise directions. The 3-minute QPP was found to highly correlate with 3-minute oscillations in a nearby sunspot. We suggest that the periodic reconnection (modulated either by a sunspot slow-mode wave or by an untwisting filament) at a magnetic null point most likely causes the repetitive particle acceleration, generating the QPP observed in HXR, microwave, and type III radio bursts.

  5. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-15

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO{sub 2} laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  6. On the nature of the extreme-ultraviolet late phase of solar flares

    SciTech Connect

    Li, Y.; Ding, M. D.; Guo, Y.; Dai, Y.

    2014-10-01

    The extreme-ultraviolet (EUV) late phase of solar flares is a second peak of warm coronal emissions (e.g., Fe XVI) for many minutes to a few hours after the GOES soft X-ray peak. It was first observed by the EUV Variability Experiment on board the Solar Dynamics Observatory (SDO). The late-phase emission originates from a second set of longer loops (late-phase loops) that are higher than the main flaring loops. It is suggested to be caused by either additional heating or long-lasting cooling. In this paper, we study the role of long-lasting cooling and additional heating in producing the EUV late phase using the enthalpy based thermal evolution of loops model. We find that a long cooling process in late-phase loops can well explain the presence of the EUV late-phase emission, but we cannot exclude the possibility of additional heating in the decay phase. Moreover, we provide two preliminary methods based on the UV and EUV emissions from the Atmospheric Imaging Assembly on board SDO to determine whether or not additional heating plays a role in the late-phase emission. Using nonlinear force-free field modeling, we study the magnetic configuration of the EUV late phase. It is found that the late phase can be generated either in hot spine field lines associated with a magnetic null point or in large-scale magnetic loops of multipolar magnetic fields. In this paper, we also discuss why the EUV late phase is usually observed in warm coronal emissions and why the majority of flares do not exhibit an EUV late phase.

  7. A filter free dual transmission grating spectrometer for the extreme-ultraviolet

    NASA Astrophysics Data System (ADS)

    Wieman, Seth R.; Didkovsky, Leonid V.; Judge, Darrell L.; Jones, Andrew R.; Harmon, Matthew

    2007-09-01

    We report the design and laboratory testing of a prototype dual-grating filter-free extreme ultraviolet (EUV) spectrometer that has potential as a highly stable instrument for measuring absolute solar irradiance in the X-ray through far ultraviolet spectral range. The instrument is based on the same freestanding transmission gratings and silicon photodiodes used on the successful Solar EUV Monitor (SEM) aboard SOHO and the EUV Spectrophotometer (ESP) part of the EVE instrument suite to be flown on SDO. Its two gratings, placed in series, along with a simple baffle structure provide excellent out of band "white" light rejection. Because the instrument does not use any thin film filters or reflective optics it is not susceptible to the degradation and instability associated with such optical elements. We present photometric efficiency data from laboratory tests with a Helium and Hydrogen discharge light source and measurements of "white" light rejection taken using the Mt Wilson Observatory 60' solar telescope.

  8. Multistep Ionization of Argon Clusters in Intense Femtosecond Extreme Ultraviolet Pulses

    SciTech Connect

    Bostedt, C.; Thomas, H.; Hoener, M.; Eremina, E.; Fennel, T.; Meiwes-Broer, K.-H.; Wabnitz, H.; Kuhlmann, M.; Ploenjes, E.; Tiedtke, K.; Treusch, R.; Feldhaus, J.; Castro, A. R. B. de; Moeller, T.

    2008-04-04

    The interaction of intense extreme ultraviolet femtosecond laser pulses ({lambda}=32.8 nm) from the FLASH free electron laser (FEL) with clusters has been investigated by means of photoelectron spectroscopy and modeled by Monte Carlo simulations. For laser intensities up to 5x10{sup 13} W/cm{sup 2}, we find that the cluster ionization process is a sequence of direct electron emission events in a developing Coulomb field. A nanoplasma is formed only at the highest investigated power densities where ionization is frustrated due to the deep cluster potential. In contrast with earlier studies in the IR and vacuum ultraviolet spectral regime, we find no evidence for electron emission from plasma heating processes.

  9. Ultrafast optical vortex beam generation in the ultraviolet.

    PubMed

    Apurv Chaitanya, N; Chaitanya Kumar, S; Devi, Kavita; Samanta, G K; Ebrahim-Zadeh, M

    2016-06-15

    We report on the generation of ultrafast vortex beams in the deep ultraviolet (DUV) wavelength range at 266 nm, for the first time to our knowledge. Using a Yb-fiber-based green source in combination with two spiral phase plates of orders 1 and 2, we were able to generate picosecond Laguerre-Gaussian (LG) beams at 532 nm. Subsequently, these LG beams were frequency doubled by single-pass, second-harmonic generation in a 10 mm-long β-BaB2O4 crystal to generate ultrafast vortex beams at 266 nm with a vortex order as high as 12, providing up to 383 mW of DUV power at a single-pass, green-to-DUV conversion efficiency of 5.2%. The generated picosecond UV vortex beam has a spectral width of 1.02 nm with a passive power stability better than 1.2% rms over >1.5  h.

  10. Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

    NASA Astrophysics Data System (ADS)

    Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

    2012-09-01

    The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition

  11. Ultraviolet-assisted microfluidic generation of ferroelectric composite particles

    PubMed Central

    Zhang, Cancan; Yu, Xiaolei; You, Sujian; Liu, Huiqin; Rao, Lang; Liu, Wei; Guo, Shi-Shang; Zhao, Xing-Zhong

    2016-01-01

    We report on the feasible fabrication of microfluidic devices for ferroelectric polymers' synthesis in a rapid and stable fashion. Utilizing micro-mixing and flow-focusing in microchannels, poly(vinylidene fluoride-trifluoroethylene) and copper phthalocyanine are uniformly dispersed in one hydrogel particle, which are then demonstrated to immediate and complete on-chip steady polymerization by moderate ultraviolet treatment. The advantage of our droplet-based microfluidic devices is generating versatile particles from simple spheres to disks or rods, and the lengths of particles can be precisely tuned from 30 to 400 μm through adjusting the flow rates of both disperse and oil phases. In addition, this mixed technique allows for the continuous production of dielectric microparticles with controlled dielectric properties between 10 and 160. Such a microfluidic device offers a flexible platform for multiferroic applications. PMID:27042248

  12. Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography

    NASA Astrophysics Data System (ADS)

    Abramov, I. S.; Gospodchikov, E. D.; Shalashov, A. G.

    2017-07-01

    In this paper, inspired by the success of recent experiments, we discuss a new possible type of sources of extreme ultraviolet radiation for the semiconductor industry, based on the radiating plasma with multiply charged ions supported in a mirror magnetic trap by high-power microwaves. We propose a simple theory that describes the main features of such source, perform modeling for a wide range of plasma parameters and magnetic configurations, compare the results to the existing experimental data, and study the prospects of the new scheme in present technological circumstances.

  13. Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

    SciTech Connect

    Higashiguchi, Takeshi Yamaguchi, Mami; Otsuka, Takamitsu; Nagata, Takeshi; Ohashi, Hayato; Li, Bowen; D’Arcy, Rebekah; Dunne, Padraig; O’Sullivan, Gerry

    2014-09-15

    Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

  14. Final Report: Spectral Analysis of L-shell Data in the Extreme Ultraviolet from Tokamak Plasmas

    SciTech Connect

    Lepson, J.; Jernigan, J. Garrett; Beiersdorfer, P.

    2016-02-05

    We performed detailed analyses of extreme ultraviolet spectra taken by Lawrence Livermore National Laboratory on the National Spherical Torus Experiment at Princeton Plasma Physics Laboratory and on the Alcator CKmod tokamak at the M.I.T. Plasma Science and Fusion Center. We focused on the emission of iron, carbon, and other elements in several spectral band pass regions covered by the Atmospheric Imaging Assembly on the Solar Dynamics Observatory. We documented emission lines of carbon not found in currently used solar databases and demonstrated that this emission was due to charge exchange.

  15. Compact multi-bounce projection system for extreme ultraviolet projection lithography

    DOEpatents

    Hudyma, Russell M.

    2002-01-01

    An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

  16. Characteristics of extreme ultraviolet emission from a discharge-produced potassium plasma for surface morphology application

    SciTech Connect

    Higashiguchi, Takeshi; Yugami, Noboru; Terauchi, Hiromitsu; Yatagai, Toyohiko; Sasaki, Wataru; D'Arcy, Rebekah; Dunne, Padraig; O'Sullivan, Gerry

    2010-03-29

    We have demonstrated a discharge-produced microplasma extreme ultraviolet source based on a pure potassium vapor. Potassium ions produced strong broadband emission around 40 nm with a bandwidth of 8 nm (full width at half-maximum). The current-voltage characteristics of microdischarge suggest that the source operates in a hollow cathode mode. By comparison with atomic structure calculations, the broadband emission is found to be primarily due to 3d-3p transitions in potassium ions ranging from K{sup 2+} to K{sup 4+}.

  17. Calibration of the thin film filters to be used on the Extreme Ultraviolet Explorer Satellite

    NASA Technical Reports Server (NTRS)

    Vallerga, John; Siegmund, O. H. W.; Everman, Elaine; Jelinsky, Patrick

    1986-01-01

    The methods of calibrating the filters used on the Extreme Ultraviolet Explorer (EUVE) astronomical satellite are described. EUVE will conduct the first all-sky survey in the entire EUV band. The measurement of the filters' transmission properties from the soft X-ray to the far UV using a grazing incidence monochromator is discussed. A particle ingress test to determine the ability of the filters to inhibit energetic particles in earth orbit from entering the detector and increasing the background is described. Problems encountered in calibrating these four filters are also presented.

  18. Ultimate Limit in the Spectral Resolution of Extreme Ultraviolet Frequency Combs

    NASA Astrophysics Data System (ADS)

    Corsi, C.; Liontos, I.; Bellini, M.; Cavalieri, S.; Cancio Pastor, P.; Siciliani de Cumis, M.; Eramo, R.

    2017-04-01

    We present the results of direct interferometric measurements on the pulse-to-pulse phase jitter of a metrological, fiber-based, infrared (IR) frequency comb. We show that the short-time evolution of such phase fluctuations, which cannot be actively controlled by any feedback system, imposes a stringent limit on the tooth linewidth of extreme ultraviolet (XUV) combs produced by high-order harmonic conversion, thus explaining the difference of 9 orders of magnitude between the coherence times of state-of-the-art IR and XUV frequency combs.

  19. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

    DOEpatents

    Montcalm, Claude; Stearns, Daniel G.; Vernon, Stephen P.

    1999-01-01

    A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

  20. Improving Ramsey spectroscopy in the extreme-ultraviolet region with a random-sampling approach

    SciTech Connect

    Eramo, R.; Bellini, M.; Corsi, C.; Liontos, I.; Cavalieri, S.

    2011-04-15

    Ramsey-like techniques, based on the coherent excitation of a sample by delayed and phase-correlated pulses, are promising tools for high-precision spectroscopic tests of QED in the extreme-ultraviolet (xuv) spectral region, but currently suffer experimental limitations related to long acquisition times and critical stability issues. Here we propose a random subsampling approach to Ramsey spectroscopy that, by allowing experimentalists to reach a given spectral resolution goal in a fraction of the usual acquisition time, leads to substantial improvements in high-resolution spectroscopy and may open the way to a widespread application of Ramsey-like techniques to precision measurements in the xuv spectral region.

  1. Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers.

    PubMed

    Li, W; Urbanski, L; Marconi, M C

    2015-12-01

    Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

  2. Heating dynamics and extreme ultraviolet radiation emission of laser-produced Sn plasmas

    SciTech Connect

    Yuspeh, S.; Sequoia, K. L.; Tao, Y.; Tillack, M. S.; Burdt, R. A.; Najmabadi, F.

    2010-06-28

    The impact of 1.064 mum laser absorption depth on the heating and in-band (2% bandwidth) 13.5 nm extreme ultraviolet emissions in Sn plasmas is investigated experimentally and numerically. In-band emission lasting longer than the laser pulse and separation between the laser absorption and in-band emission region are observed. Maximum efficiency is achieved by additional heating of the core of the plasma to allow the optimal temperature to expand to a lower and more optically thin density. This leads to higher temperature plasma that emits less in-band light as compared to CO{sub 2} produced plasma sources for the same application.

  3. Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling

    NASA Astrophysics Data System (ADS)

    Kang, In-Yong; Kim, Tae Geun; Lee, Seung Yoon; Ahn, Jinho; Chung, Yong-Chae

    2004-06-01

    The performance of a multilayer extreme ultraviolet (EUV) reflector has a direct bearing on process throughput and the cost of new technology. Using measured data from an experimentally manufactured reflector, we intend, in this work, to show that the reflectivity of the Bragg reflector can be characterized by using structural parameters such as the d-spacing, density, thicknesses of the interdiffusion layers and oxidation layer. This quantitative analysis of the reflectivity derived from the structural parameters can be utilized to optimize the optical properties of the existing Mo/Ru/Si system and to provide fundamental insights into the science involved in a Bragg EUV reflector.

  4. Development of a Wafer Positioning System for the Sandia Extreme Ultraviolet Lithography Tool

    NASA Technical Reports Server (NTRS)

    Wronosky, John B.; Smith, Tony G.; Darnold, Joel R.

    1996-01-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  5. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    SciTech Connect

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-15

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  6. Grazing incidence metal optics for the Berkeley Extreme Ultraviolet Explorer satellite - A progress report

    NASA Technical Reports Server (NTRS)

    Finley, D.; Malina, R. F.; Bowyer, S.

    1985-01-01

    The four flight Wolter-Schwarzschild mirrors currently under fabrication for the Extreme Ultraviolet Explorer (EUVE) satellite are described. The principal figuring operation of these grazing incidence metal mirrors (gold over nickel on an aluminum substrate) is carried out by diamond turning at the Lawrence Livermore National Laboratories. Turning has been accomplished and optical testing results analyzed for three of the mirrors. As-turned values of 1.7 arc sec full width at half maximum (FWHM) and half energy width (HEW) of 5 arc seconds in the visible have been achieved. These results illustrate the great potential of precision fabrication technology for the production of large grazing incidence optics.

  7. High resolution extreme ultraviolet spectrometer for an electron beam ion trap

    SciTech Connect

    Ohashi, Hayato; Yatsurugi, Junji; Nakamura, Nobuyuki; Sakaue, Hiroyuki A.

    2011-08-15

    An extreme ultraviolet spectrometer has been developed for spectroscopic studies of highly charged ions with an electron beam ion trap. It has a slit-less configuration with a spherical varied-line-spacing grating that provides a flat focal plane for grazing incidence light. Alternative use of two different gratings enables us to cover the wavelength range 1-25 nm. Test observations with the Tokyo electron beam ion trap demonstrate the high performance of the present spectrometer such as a resolving power of above 1000.

  8. Surface evaluation of the grazing incidence mirrors for the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Green, James; Finley, David S.; Bowyer, Stuart; Malina, Roger F.

    1987-01-01

    The EUV scattering from the Wolter-Schwarzschild type I short wavelength scanner mirror aboard the Extreme Ultraviolet Explorer is measured, and the results are used to evaluate the surface microroughness of the mirror. It is found that the most likely values for the mirror surface are sigma = 20 A, and rho = 40 microns. These results are consistent with previous estimates, but with a higher degree of certainty. The full-scale simulation presented here allows over 99 percent of the light distribution to be reasonably modeled.

  9. Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool

    SciTech Connect

    Wronosky, J.B.; Smith, T.G.; Darnold, J.R.

    1995-12-01

    A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

  10. Single shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution

    SciTech Connect

    Jones, Juanita; Brewer, Courtney A.; Brizuela, Fernando; Wachulak, Przemyslaw; Martz, Dale H.; Chao, Weilun; Anderson, Erik H.; Attwood, David T.; Vinogradov, Alexander V.; Artyukov, Igor A.; Ponomareko, Alexander G.; Kondratenko, Valeriy V.; Marconi, Mario C.; Rocca, Jorge J.; Menoni, Carmen S.

    2008-01-07

    We have demonstrated near-wavelength resolution microscopy in the extreme ultraviolet. Images of 50 nm diameter nanotubes were obtained with a single {approx}1 ns duration pulse from a desk-top size 46.9 nm laser. We measured the modulation transfer function of the microscope for three different numerical aperture zone plate objectives, demonstrating that 54 nm half-period structures can be resolved. The combination of near-wavelength spatial resolution and high temporal resolution opens myriad opportunities in imaging, such as the ability to directly investigate dynamics of nanoscale structures.

  11. Real-time observations of extreme-ultraviolet aerial images by fluorescence microimaging

    SciTech Connect

    La Fontaine, B. ); White, D.L. ); Wood, O.R. II ); MacDowell, A.A.; Tan, Z. ); Taylor, G.N. ); Tennant, D.M. ); Hulbert, S.L. )

    1994-11-01

    A new technique, fluorescence microimaging (FMI), using single-crystal phosphors was used to look directly at aerial images produced by an extreme-ultraviolet (EUV) camera operating at a wavelength of 139 A. The achieved spatial resolution was estimated to be [similar to]0.2 [mu]m. A comparison of this technique with the usual resist-exposure scanning electron microscopy inspection technique as a means of focusing a 20[times]EUV Schwarzschild camera was performed. FMI could in principle be improved to view fluorescent images with features as small as 0.07 [mu]m, in real time.

  12. Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range

    SciTech Connect

    Aruev, P N; Barysheva, Mariya M; Ber, B Ya; Zabrodskaya, N V; Zabrodskii, V V; Lopatin, A Ya; Pestov, Alexey E; Petrenko, M V; Polkovnikov, V N; Salashchenko, Nikolai N; Sukhanov, V L; Chkhalo, Nikolai I

    2012-10-31

    The procedure of manufacturing silicon photodiodes with an integrated Zr/Si filter for extreme ultraviolet (EUV) spectral range is developed. A setup for measuring the sensitivity profile of detectors with spatial resolution better than 100 {mu}m is fabricated. The optical properties of silicon photodiodes in the EUV and visible spectral ranges are investigated. Some characteristics of SPD-100UV diodes with Zr/Si coating and without it, as well as of AXUV-100 diodes, are compared. In all types of detectors a narrow region beyond the operating aperture is found to be sensitive to the visible light. (photodetectors)

  13. Grazing incidence metal optics for the Berkeley Extreme Ultraviolet Explorer satellite - A progress report

    NASA Technical Reports Server (NTRS)

    Finley, D.; Malina, R. F.; Bowyer, S.

    1985-01-01

    The four flight Wolter-Schwarzschild mirrors currently under fabrication for the Extreme Ultraviolet Explorer (EUVE) satellite are described. The principal figuring operation of these grazing incidence metal mirrors (gold over nickel on an aluminum substrate) is carried out by diamond turning at the Lawrence Livermore National Laboratories. Turning has been accomplished and optical testing results analyzed for three of the mirrors. As-turned values of 1.7 arc sec full width at half maximum (FWHM) and half energy width (HEW) of 5 arc seconds in the visible have been achieved. These results illustrate the great potential of precision fabrication technology for the production of large grazing incidence optics.

  14. Exploring the temporally resolved electron density evolution in extreme ultra-violet induced plasmas

    NASA Astrophysics Data System (ADS)

    van der Horst, R. M.; Beckers, J.; Nijdam, S.; Kroesen, G. M. W.

    2014-07-01

    We measured the electron density in an extreme ultra-violet (EUV) induced plasma. This is achieved in a low-pressure argon plasma by using a method called microwave cavity resonance spectroscopy. The measured electron density just after the EUV pulse is 2.6 × 1016 m-3. This is in good agreement with a theoretical prediction from photo-ionization, which yields a density of 4.5 × 1016 m-3. After the EUV pulse the density slightly increases due to electron impact ionization. The plasma (i.e. electron density) decays in tens of microseconds.

  15. Evolution of laser-produced Sn extreme ultraviolet source diameter for high-brightness source

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Arai, Goki; Hara, Hiroyuki; Higashiguchi, Takeshi; Ohashi, Hayato; Sunahara, Atsushi; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Miura, Taisuke; Mocek, Tomas; Endo, Akira

    2014-08-18

    We have investigated the effect of irradiation of solid Sn targets with laser pulses of sub-ns duration and sub-mJ energy on the diameter of the extreme ultraviolet (EUV) emitting region and source conversion efficiency. It was found that an in-band EUV source diameter as low as 18 μm was produced due to the short scale length of a plasma produced by a sub-ns laser. Most of the EUV emission occurs in a narrow region with a plasma density close to the critical density value. Such EUV sources are suitable for high brightness and high repetition rate metrology applications.

  16. Design, fabrication and performance of two grazing incidence telescopes for celestial extreme ultraviolet astronomy

    NASA Technical Reports Server (NTRS)

    Lampton, M.; Cash, W.; Malina, R. F.; Bowyer, S.

    1977-01-01

    The design and performance of grazing incidence telescopes for celestial extreme ultraviolet (EUV) astronomy are described. The telescopes basically consist of a star tracker, collimator, grazing incidence mirror, vacuum box lid, vacuum housing, filters, a ranicon detector, an electronics box, and an aspect camera. For the survey mirror a Wolter-Schwarzschild type II configuration was selected. Diamond-turning was used for mirror fabrication, a technique which machines surfaces to the order of 10 microns over the required dimensions. The design of the EUV spectrometer is discussed with particular reference to the optics for a primarily spectroscopic application and the fabrication of the f/10 optics.

  17. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  18. Rare-earth plasma extreme ultraviolet sources at 6.5-6.7 nm

    SciTech Connect

    Otsuka, Takamitsu; Higashiguchi, Takeshi; Yugami, Noboru; Yatagai, Toyohiko; Kilbane, Deirdre; White, John; Dunne, Padraig; O'Sullivan, Gerry; Jiang, Weihua; Endo, Akira

    2010-09-13

    We have demonstrated a laser-produced plasma extreme ultraviolet source operating in the 6.5-6.7 nm region based on rare-earth targets of Gd and Tb coupled with a Mo/B{sub 4}C multilayer mirror. Multiply charged ions produce strong resonance emission lines, which combine to yield an intense unresolved transition array. The spectra of these resonant lines around 6.7 nm (in-band: 6.7 nm {+-}1%) suggest that the in-band emission increases with increased plasma volume by suppressing the plasma hydrodynamic expansion loss at an electron temperature of about 50 eV, resulting in maximized emission.

  19. Extreme ultraviolet source at 6.7 nm based on a low-density plasma

    SciTech Connect

    Higashiguchi, Takeshi; Yugami, Noboru; Otsuka, Takamitsu; Jiang, Weihua; Endo, Akira; Li Bowen; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry

    2011-11-07

    We demonstrate an efficient extreme ultraviolet (EUV) source for operation at {lambda} = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

  20. The extreme ultraviolet spectrograph: A radial groove grating, sounding rocket-borne, astronomical instrument

    NASA Technical Reports Server (NTRS)

    Wilkinson, Erik; Green, James C.; Cash, Webster

    1993-01-01

    The design, calibration, and sounding rocket flight performance of a novel spectrograph suitable for moderate-resolution EUV spectroscopy are presented. The sounding rocket-borne instrument uses a radial groove grating to maintain a high system efficiency while controlling the aberrations induced when doing spectroscopy in a converging beam. The instrument has a resolution of approximately 2 A across the 200-330 A bandpass with an average effective area of 2 sq cm. The instrument, called the Extreme Ultraviolet Spectrograph, acquired the first EUV spectra in this wavelength region of the hot white dwarf G191-B2B and the late-type star Capella.

  1. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection.

    PubMed

    Chai, Kil-Byoung; Bellan, Paul M

    2013-12-01

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10(6) frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  2. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    NASA Astrophysics Data System (ADS)

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-01

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 106 frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  3. Research Studies on Extreme Ultraviolet and Soft X-Ray Lasers

    DTIC Science & Technology

    1992-01-10

    Stardard Form 298 (Rev 2-89) P’"%c’,70 t)" ANSi ’,to Z39-�-IC2 Research Studies on Extreme Ultraviolet and Soft X-ray Lasers Final Report S. E. Harris...Organization. We have also obtained substantial help with equipment from Lawrence Livermore National Laboratory. The fsec laser system was built with Army...Laser System An early version of a sub-picosecond laser system has been developed. The system consists of a synchronously pumped 85 fsec dye laser

  4. Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography

    SciTech Connect

    Rao, V.; Hutchinson, J.; Holl, S.; Langston, J.; Henderson, C.; Wheeler, D.R.; Cardinale, G.; OConnell, D.; Goldsmith, J.; Bohland, J.; Taylor, G.; Sinta, R.

    1998-11-01

    The maturity and acceptance of top surface imaging (TSI) technology have been hampered by several factors including inadequate resist sensitivity and line edge roughness. We have found that the use of a chemically amplified resist can improve the sensitivity in these systems by 1.5{endash} 2{times} without compromising the line edge roughness. In addition, we have shown improved line edge roughness by increasing the molecular weight of the polymeric resin in the resist. Using these materials approaches, we have been able to show excellent resolution images with the TSI process for both 193 nm and extreme ultraviolet (13.4 nm) patterning. {copyright} {ital 1998 American Vacuum Society.}

  5. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

    SciTech Connect

    Naulleau, Patrick; George, Simi

    2011-01-26

    In the case of extreme ultraviolet (EUV) lithography, modeling has shown that reflector phase roughness on the lithographic mask is a significant concern due to the image plan speckle it causes and the resulting line-edge roughness on imaged features. Modeling results have recently been used to determine the requirements for future production worthy masks yielding the extremely stringent specification of 50 pm rms roughness. Owing to the scale of the problem in terms of memory requirements, past modeling results have all been based on the thin mask approximation. EUV masks, however, are inherently three dimensional in nature and thus the question arises as to the validity of the thin mask approximation. Here we directly compare image plane speckle calculation results using the fast two dimensional thin mask model to rigorous finite-difference time-domain results and find the two methods to be comparable.

  6. Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

    NASA Astrophysics Data System (ADS)

    Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael J.; Younkin, Todd R.; Whittaker, Andrew K.

    2011-02-01

    Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO 2) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO 2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO 2 moieties to a sulfide phase was observed using XPS.

  7. EIT: Solar corona synoptic observations from SOHO with an Extreme-ultraviolet Imaging Telescope

    NASA Technical Reports Server (NTRS)

    Delaboudiniere, J. P.; Gabriel, A. H.; Artzner, G. E.; Michels, D. J.; Dere, K. P.; Howard, R. A.; Catura, R.; Stern, R.; Lemen, J.; Neupert, W.

    1988-01-01

    The Extreme-ultraviolet Imaging Telescope (EIT) of SOHO (solar and heliospheric observatory) will provide full disk images in emission lines formed at temperatures that map solar structures ranging from the chromospheric network to the hot magnetically confined plasma in the corona. Images in four narrow bandpasses will be obtained using normal incidence multilayered optics deposited on quadrants of a Ritchey-Chretien telescope. The EIT is capable of providing a uniform one arc second resolution over its entire 50 by 50 arc min field of view. Data from the EIT will be extremely valuable for identifying and interpreting the spatial and temperature fine structures of the solar atmosphere. Temporal analysis will provide information on the stability of these structures and identify dynamical processes. EIT images, issued daily, will provide the global corona context for aid in unifying the investigations and in forming the observing plans for SOHO coronal instruments.

  8. Response of Jupiter's inner magnetosphere to the solar wind derived from extreme ultraviolet monitoring of the Io plasma torus

    NASA Astrophysics Data System (ADS)

    Murakami, Go; Yoshioka, Kazuo; Yamazaki, Atsushi; Tsuchiya, Fuminori; Kimura, Tomoki; Tao, Chihiro; Kita, Hajime; Kagitani, Masato; Sakanoi, Takeshi; Uemizu, Kazunori; Kasaba, Yasumasa; Yoshikawa, Ichiro; Fujimoto, Masaki

    2016-12-01

    Because Jupiter's magnetosphere is huge and is rotationally dominated, solar wind influence on its inner part has been thought to be negligible. Meanwhile, dawn-dusk asymmetric features of this region have been reported. Presence of dawn-to-dusk electric field is one of the leading explanations of the asymmetry; however, the physical process of generating such an intense electric field still remains unclear. Here we present long and continuous monitoring of the extreme ultraviolet emissions from the Io plasma torus in Jupiter's inner magnetosphere made by the Hisaki satellite between December 2013 and March 2014. We found five occasions where the dusk/dawn brightness ratio was enhanced above 2.5 in response to rapid increase of the solar wind dynamic pressure. The enhancement is achieved as the dusk region brightens and the dawn region dims. The observation indicates that dawn-to-dusk electric field in the inner magnetosphere is enhanced under compressed conditions.

  9. Highly sensitive visible-blind extreme ultraviolet Ni/4H-SiC Schottky photodiodes with large detection area.

    PubMed

    Hu, Jun; Xin, Xiaobin; Zhao, Jian H; Yan, Feng; Guan, Bing; Seely, John; Kjornrattanawanich, Benjawan

    2006-06-01

    Ni/4H-SiC Schottky photodiodes of 5 mm x 5 mm area have been fabricated and characterized. The photodiodes show less than 0.1 pA dark current at -4 V and an ideality factor of 1.06. A quantum efficiency (QE) between 3 and 400 nm has been calibrated and compared with Si photodiodes optimized for extreme ultraviolet (EUV) detection. In the EUV region, the QE of SiC detectors increases from 0.14 electrons/photon at 120 nm to 30 electrons/photon at 3 nm. The mean energy of electron-hole pair generation of 4H-SiC estimated from the spectral QE is found to be 7.9 eV.

  10. X-ray and extreme ultraviolet spectroscopy on DIII-D

    NASA Astrophysics Data System (ADS)

    Victor, B. S.; Allen, S. L.; Beiersdorfer, P.; Magee, E. W.

    2017-06-01

    Two spectrometers were installed to measure tungsten emission in the core of DIII-D plasmas during a metal rings experimental campaign. The spectral range of the high-resolution (1340 spectral channels), variable-ruled grating X-ray and Extreme Ultraviolet Spectrometer (XEUS) extends from 10-71 dot A. The spectral range of the second spectrometer, the Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS), measures between 31-174 dot A. Three groups of tungsten lines were identified with XEUS: W38+-W45+ from 47-63 dot A, W27+-W35+ from 45-55 dot A, and W28+-W33+ from 16-30 dot A. Emission lines from tungsten charge states W28+, W43+, W44+, and W45+ are identified and the line amplitude is presented versus time. Peak emission of W43+-W45+ occurs between core Te=2.5-3 keV, and peak emission of W28+ occurs at core Te<=1.3 keV. One group of tungsten lines, W40+-W45+, between 120-140 dot A, was identified with LoWEUS. W43+-W45+ lines measured with LoWEUS track the sawtooth cycle. Sensitivity to the sawtooth cycle and the correlation of the peak emission with core electron temperature show that these spectrometers track the on-axis tungsten emission of DIII-D plasmas.

  11. Detection of rotational modulation in the coronal extreme-ultraviolet emission from V711 Tauri?

    PubMed

    Drake, J J; Brown, A; Patterer, R J; Vedder, P W; Bowyer, S; Guinan, E F

    1994-01-20

    The RS CVn binary V711 Tauri was observed by the Extreme Ultraviolet Explorer satellite (EUVE) twice during the latter half of 1992, for periods lasting several days. Light curves for the waveband 60-180 angstroms derived from the all-sky survey scanning in August and from a pointed calibration observation made in October both exhibit a modulation of about 40%. The modulation in both data sets is very similar, with minimum flux occurring near orbital phase phi=0.5. Analysis using a two-temperature optically thin plasma emission model reveals that most of the detected extreme ultraviolet (EUV) flux emanates from hot (approximately 10(7) K) coronal plasma. The modulation is probably mostly due to either flare-like activity or to rotational occultation of a long-lived, compact, and especially bright coronal structure on the more active star of the system. The phased data support the latter hypothesis. This coronal structure is then likely to be associated with the persistent spot patterns seen on V711 Tau when using Doppler and photometric surface imaging techniques. Comparison with contemporaneous Stromgren b-band photometry indicates that the optical minimum light leads the EUV maximum light by 90 degrees in phase.

  12. Large-scale Extreme-Ultraviolet Disturbances Associated with a Limb Coronal Mass Ejection

    NASA Astrophysics Data System (ADS)

    Dai, Y.; Auchère, F.; Vial, J.-C.; Tang, Y. H.; Zong, W. G.

    2010-01-01

    We present composite observations of a coronal mass ejection (CME) and the associated large-scale extreme-ultraviolet (EUV) disturbances on 2007 December 31 by the Extreme-ultraviolet Imager (EUVI) and COR1 coronagraph on board the recent Solar Terrestrial Relations Observatory mission. For this limb event, the EUV disturbances exhibit some typical characteristics of EUV Imaging Telescope waves: (1) in the 195 Å bandpass, diffuse brightenings are observed propagating oppositely away from the flare site with a velocity of ~260 km s-1, leaving dimmings behind; (2) when the brightenings encounter the boundary of a polar coronal hole, they stop there to form a stationary front. Multi-temperature analysis of the propagating EUV disturbances favors a heating process over a density enhancement in the disturbance region. Furthermore, the EUVI-COR1 composite display shows unambiguously that the propagation of the diffuse brightenings coincides with a large lateral expansion of the CME, which consequently results in a double-loop-structured CME leading edge. Based on these observational facts, we suggest that the wave-like EUV disturbances are a result of magnetic reconfiguration related to the CME liftoff rather than true waves in the corona. Reconnections between the expanding CME magnetic field lines and surrounding quiet-Sun magnetic loops account for the propagating diffuse brightenings; dimmings appear behind them as a consequence of volume expansion. X-ray and radio data provide us with complementary evidence.

  13. Overview of Key Results from SDO Extreme ultraviolet Variability Experiment (EVE)

    NASA Astrophysics Data System (ADS)

    Woods, Tom

    2016-10-01

    The SDO Extreme ultraviolet Variability Experiment (EVE) includes several channels to observe the solar extreme ultraviolet (EUV) spectral irradiance from 1 to 106 nm. These channels include the Multiple EUV Grating Spectrograph (MEGS) A, B, and P channels from the University of Colorado (CU) and the EUV SpectroPhometer (ESP) channels from the University of Southern California (USC). The solar EUV spectrum is rich in many different emission lines from the corona, transition region, and chromosphere. The EVE full-disk irradiance spectra are important for studying the solar impacts in Earth’s ionosphere and thermosphere and are useful for space weather operations. In addition, the EVE observations, with its high spectral resolution of 0.1 nm and in collaboration with AIA solar EUV images, have proven valuable for studying active region evolution and explosive energy release during flares and coronal eruptions. These SDO measurements have revealed interesting results such as understanding the flare variability over all wavelengths, discovering and classifying different flare phases, using coronal dimming measurements to predict CME properties of mass and velocity, and exploring the role of nano-flares in continual heating of active regions.

  14. Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources

    SciTech Connect

    Sizyuk, Tatyana; Hassanein, Ahmed

    2014-08-15

    Photon sources produced by laser beams with moderate laser intensities, up to 10{sup 14 }W/cm{sup 2}, are being developed for many industrial applications. The performance requirements for high volume manufacture devices necessitate extensive experimental research supported by theoretical plasma analysis and modeling predictions. We simulated laser produced plasma sources currently being developed for several applications such as extreme ultraviolet lithography using 13.5% ± 1% nm bandwidth, possibly beyond extreme ultraviolet lithography using 6.× nm wavelengths, and water-window microscopy utilizing 2.48 nm (La-α) and 2.88 nm (He-α) emission. We comprehensively modeled plasma evolution from solid/liquid tin, gadolinium, and nitrogen targets as three promising materials for the above described sources, respectively. Results of our analysis for plasma characteristics during the entire course of plasma evolution showed the dependence of source conversion efficiency (CE), i.e., laser energy to photons at the desired wavelength, on plasma electron density gradient. Our results showed that utilizing laser intensities which produce hotter plasma than the optimum emission temperatures allows increasing CE for all considered sources that, however, restricted by the reabsorption processes around the main emission region and this restriction is especially actual for the 6.× nm sources.

  15. Emission Lines of Fe XI - XIII in the Extreme Ultraviolet Region

    NASA Astrophysics Data System (ADS)

    Lepson, Jaan; Beiersdorfer, Peter; Liedahl, Duane; Desai, Priya; Brickhouse, Nancy; Dupree, Andrea; Kahn, Steven

    2009-05-01

    Iron is one of the most abundant heavy elements in extreme ultraviolet spectra of astrophysical and laboratory plasmas, and its various ions radiate profusely in the extreme ultraviolet (EUV) wavelength band. Iron emission in the EUV provides important d iagnostic tools for such properties as plasma temperature and density, and perhaps even magnetic field strength. Despite its importance to astrophysics and magnetic fusion, knowledge of the EUV spectrum of iron is incomplete. Identification of iron emis sion lines is hampered by the paucity of accurate laboratory measurements and the uncertainty of even the best atomic models. As part of a project to measure and compile emission line data in the EUV, we present here spectra and lines of Fe XI - XIII recorded on the Livermore EBIT-II electron beam ion trap in the 50 - 120 åregion. We measured line positions to 0.02 åand relative intensities with an accuracy of one part in twenty. Many new lines are identified and added to the available databa ses. Part of this work was performed under the auspices of the U S Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344 and was supported by NASA's Astronomy and Physics Research and Analysis Program under Con t ract NNH07AF811.

  16. Effect of stray light correction of extreme-ultraviolet solar images in tomography

    NASA Astrophysics Data System (ADS)

    Lloveras, D. G.; Vásquez, A. M.; Shearer, P.; Frazin, R. A.

    2017-10-01

    The Extreme UltraViolet Imager (EUVI) telescope on board the Solar TErrestrial RElations Observatory (STEREO) mission provides extreme-ultraviolet (EUV) coronal images of the full Sun. Using time series of EUV images, the differential emission measure tomography (DEMT) technique allows the determination of the three-dimensional (3D) distribution of the coronal electron density and temperature in the inner corona. EUV images are affected by stray light contamination which can be effectively removed if the point-spread function (PSF) of the instrument is well determined, as it is the case for EUVI. We show the results of a detailed analysis of the impact of EUVI stray light removal in DEMT results. To this end we analyze Carrington Rotation (CR)-2081 during the last solar minimum, characterized by a highly axisymmetric coronal structure. We find that stray light decontamination of EUVI images implies a systematic decrease of the derived electron density scale height and a systematic increase of the derived coronal base density, while its effect on the derived temperature is not systematic neither significant. We detail the results of the analysis in quantitative fashion.

  17. Detection of rotational modulation in the coronal extreme-ultraviolet emission from V711 Tauri?

    NASA Technical Reports Server (NTRS)

    Drake, Jeremy J.; Brown, Alex; Patterer, Robert J.; Vedder, Peter W.; Bowyer, Stuart; Guinan, Edward F.

    1994-01-01

    The RS CVn binary V711 Tauri was observed by the Extreme Ultraviolet Explorer satellite (EUVE) twice during the latter half of 1992, for periods lasting several days. Light curves for the waveband 60-180 A derived from the all-sky survey scanning in August and from a pointed calibration observation made in October both exhibit a modulation of about 40%. The modulation in both data sets is very similar, with minimum flux occurring near orbital phase phi = 0.5. Analysis using a two-temperature optically thin plasma emission model reveals that most of the detected extreme ultraviolet (EUV) flux emanates from hot (approximately 10(exp 7) K) coronal plasma. The modulation is probably mostly due to either flare-like activity or to rotational occultation of a long-lived, compact, and especially bright coronal structure on the more active star of the system. The phased data support the latter hypothesis. This coronal structure is then likely to be associated with the presistent spot patterns seen on V711 Tau when using Doppler and photometric surface imaging techniques. Comparison with contemporaneous Stroemgren b-band photometry indicates that the optical minimum light leads the EUV maximum light by 90 deg in phase.

  18. Spectral photometry of extreme helium stars: Ultraviolet fluxes and effective temperature

    NASA Technical Reports Server (NTRS)

    Drilling, J. S.; Schoenberner, D.; Heber, U.; Lynas-Gray, A. E.

    1982-01-01

    Ultraviolet flux distributions are presented for the extremely helium rich stars BD +10 deg 2179, HD 124448, LSS 3378, BD -9 deg 4395, LSE 78, HD 160641, LSIV -1 deg 2, BD 1 deg 3438, HD 168476, MV Sgr, LS IV-14 deg 109 (CD -35 deg 11760), LSII +33 deg 5 and BD +1 deg 4381 (LSIV +2 deg 13) obtained with the International Ultraviolet Explorer (IUE). Broad band photometry and a newly computed grid of line blanketed model atmospheres were used to determine accurate angular diameters and total stellar fluxes. The resultant effective temperatures are in most cases in satisfactory agreement with those based on broad band photometry and/or high resolution spectroscopy in the visible. For two objects, LSII +33 deg 5 and LSE 78, disagreement was found between the IUE observations and broadband photometry: the colors predict temperatures around 20,000 K, whereas the UV spectra indicate much lower photospheric temperatures of 14,000 to 15,000 K. The new temperature scale for extreme helium stars extends to lower effective temperatures than that of Heber and Schoenberner (1981) and covers the range from 8,500 K to 32,000 K.

  19. Instrumentation on the RAIDS experiment 2: Extreme ultraviolet spectrometer, photometer, and near IR spectrometer

    NASA Astrophysics Data System (ADS)

    Christensen, A. B.; Kayser, D. C.; Pranke, J. B.; Chakrabarti, Supriya; McCoy, R. P.

    1994-02-01

    The RAIDS experiment consists of eight instruments spanning the wavelength range from the extreme ultraviolet (55 nm) to the near infrared (800 nm) oriented to view the Earth's limb from the NOAA-J spacecraft to be launched into a circular orbit in 1993. Through measurements of the natural optical emissions and scattered sunlight originating in the upper atmosphere including the mesosphere and thermosphere, state variables such as temperature, composition, density and ion concentration of this region will be inferred. This report describes the subset of instruments fabricated or otherwise provided by the Space and Environment Technology Center (formerly Space Sciences Laboratory) at The Aerospace Corp. The companion to this report describes the instruments from the Naval Research Laboratory. The Extreme Ultraviolet Spectrograph (EUVS), the three fixed filter photometers OI (630), OI (777), and Na (589), and the near infrared spectrometer (NIR) will be described. These are all mounted on a mechanical scan platform that scans the limb from approximately 75 to 750 km in the orbital plane of the satellite every 90 seconds.

  20. [Design of optical system for solar extreme-ultraviolet imaging spectrometer].

    PubMed

    Liu, Zhuang; Gong, Yan

    2012-03-01

    Hyper-spectral imaging observation of the sun in the EUV region is an important method of research for solar's upper transition region, corona and plasma's physical property. Based on the application objective of solar extreme ultraviolet imaging spectrometer (SEUIS), combined with the current states of domestic and foreign extreme ultraviolet imaging spectrometer, a few of parameters for SEUIS design were drew up in the present paper. The advantages and disadvantages of all kinds of optical configurations were discussed,and the configuration of combination of telescope and spectrometer was chosen. The available main components were also described, off-axis parabolic mirror was chosen for telescope, and a high density uniform-line-space toroidal grating for dispersion device. The optical system which satisfies the performance parameters was designed. The design process, detailed parameters and results were presented in the end. The working wavelength of the optics system is 17.0-21.0 nm, the field of view is 1 228" x 1 024", the spatial resolution is 0.8 arc sec x pixel(-1), the spectral resolution is about 0.00198 nm x pixel(-1), and the total length of system is about 2.8 m.

  1. Breaking DNA strands by extreme-ultraviolet laser pulses in vacuum

    NASA Astrophysics Data System (ADS)

    Nováková, Eva; Vyšín, Luděk; Burian, Tomáš; Juha, Libor; Davídková, Marie; Múčka, Viliam; Čuba, Václav; Grisham, Michael E.; Heinbuch, Scott; Rocca, Jorge J.

    2015-04-01

    Ionizing radiation induces a variety of DNA damages including single-strand breaks (SSBs), double-strand breaks (DSBs), abasic sites, modified sugars, and bases. Most theoretical and experimental studies have been focused on DNA strand scissions, in particular production of DNA double-strand breaks. DSBs have been proven to be a key damage at a molecular level responsible for the formation of chromosomal aberrations, leading often to cell death. We have studied the nature of DNA damage induced directly by the pulsed 46.9-nm (26.5 eV) radiation provided by an extreme ultraviolet (XUV) capillary-discharge Ne-like Ar laser (CDL). Doses up to 45 kGy were delivered with a repetition rate of 3 Hz. We studied the dependence of the yield of SSBs and DSBs of a simple model of DNA molecule (pBR322) on the CDL pulse fluence. Agarose gel electrophoresis method was used for determination of both SSB and DSB yields. The action cross sections of the single- and double-strand breaks of pBR322 plasmid DNA in solid state were determined. We observed an increase in the efficiency of strand-break induction in the supercoiled DNA as a function of laser pulse fluence. Results are compared to those acquired at synchrotron radiation facilities and other sources of extreme-ultraviolet and soft x-ray radiation.

  2. Polydopamine Generates Hydroxyl Free Radicals under Ultraviolet-Light Illumination.

    PubMed

    Wang, Zehuan; Tang, Feng; Fan, Hailong; Wang, Le; Jin, Zhaoxia

    2017-06-13

    Polydopamine (PDA) generally demonstrates as an efficient free-radical scavenger. However, its free-radical chemistry under illumination is unclear, which becomes important in view of growing studies of polydopamine applications in photoprotector and photothermal therapy. In this study, for the first time, we reported an experimental investigation of the generation of hydroxyl free radicals from ultraviolet (UV)-illuminated polydopamine in an aqueous environment. By using terephthalic acid as fluorescent probe, we measured hydroxyl radicals generated from UV-illuminated polydopamine with different shapes and sizes. The morphology of PDA shows significant influence on its productions of hydroxyl free radicals. Through characterizations of UV-vis absorption spectroscopy, fluorescence spectroscopy, X-ray photoelectron spectrometry, mass spectrometry, and thermogravimetric analysis, we demonstrated the change of PDA nanomaterials brought by UV-light illumination in composition and thermal stability. We proposed a tentative mechanism for interpreting the relationship between morphology and photostability of PDA nanomaterials. These results reveal underlying complexity of polydopamine chemistry under light illumination that will deepen our understanding and benefit its further application.

  3. Two-colour pump–probe experiments with a twin-pulse-seed extreme ultraviolet free-electron laser

    PubMed Central

    Allaria, E.; Bencivenga, F.; Borghes, R.; Capotondi, F.; Castronovo, D.; Charalambous, P.; Cinquegrana, P.; Danailov, M. B.; De Ninno, G.; Demidovich, A.; Di Mitri, S.; Diviacco, B.; Fausti, D.; Fawley, W. M.; Ferrari, E.; Froehlich, L.; Gauthier, D.; Gessini, A.; Giannessi, L.; Ivanov, R.; Kiskinova, M.; Kurdi, G.; Mahieu, B.; Mahne, N.; Nikolov, I.; Masciovecchio, C.; Pedersoli, E.; Penco, G.; Raimondi, L.; Serpico, C.; Sigalotti, P.; Spampinati, S.; Spezzani, C.; Svetina, C.; Trovò, M.; Zangrando, M.

    2013-01-01

    Exploring the dynamics of matter driven to extreme non-equilibrium states by an intense ultrashort X-ray pulse is becoming reality, thanks to the advent of free-electron laser technology that allows development of different schemes for probing the response at variable time delay with a second pulse. Here we report the generation of two-colour extreme ultraviolet pulses of controlled wavelengths, intensity and timing by seeding of high-gain harmonic generation free-electron laser with multiple independent laser pulses. The potential of this new scheme is demonstrated by the time evolution of a titanium-grating diffraction pattern, tuning the two coherent pulses to the titanium M-resonance and varying their intensities. This reveals that an intense pulse induces abrupt pattern changes on a time scale shorter than hydrodynamic expansion and ablation. This result exemplifies the essential capabilities of the jitter-free multiple-colour free-electron laser pulse sequences to study evolving states of matter with element sensitivity. PMID:24048228

  4. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas.

    PubMed

    Musgrave, Christopher S A; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

    2017-03-01

    With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 10(10) and 10(11) W/cm(2)) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

  5. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

    NASA Astrophysics Data System (ADS)

    Musgrave, Christopher S. A.; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

    2017-03-01

    With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

  6. Surface modification of polymers for biocompatibility via exposure to extreme ultraviolet radiation.

    PubMed

    Inam Ul Ahad; Bartnik, Andrzej; Fiedorowicz, Henryk; Kostecki, Jerzy; Korczyc, Barbara; Ciach, Tomasz; Brabazon, Dermot

    2014-09-01

    Polymeric biomaterials are being widely used for the treatment of various traumata, diseases and defects in human beings due to ease in their synthesis. As biomaterials have direct interaction with the extracellular environment in the biological world, biocompatibility is a topic of great significance. The introduction or enhancement of biocompatibility in certain polymers is still a challenge to overcome. Polymer biocompatibility can be controlled by surface modification. Various physical and chemical methods (e.g., chemical and plasma treatment, ion implantation, and ultraviolet irradiation etc.) are in use or being developed for the modification of polymer surfaces. However an important limitation in their employment is the alteration of bulk material. Different surface and bulk properties of biomaterials are often desirable for biomedical applications. Because extreme ultraviolet (EUV) radiation penetration is quite limited even in low density mediums, it could be possible to use it for surface modification without influencing the bulk material. This article reviews the degree of biocompatibility of different polymeric biomaterials being currently employed in various biomedical applications, the surface properties required to be modified for biocompatibility control, plasma and laser ablation based surface modification techniques, and research studies indicating possible use of EUV for enhancing biocompatibility.

  7. The extreme ultraviolet spectrum of the kinetically dominated quasar 3C 270.1

    NASA Astrophysics Data System (ADS)

    Punsly, Brian; Marziani, Paola

    2015-10-01

    Only a handful of quasars have been identified as kinetically dominated, their long-term time-averaged jet power, overline{Q}, exceeds the bolometric thermal emission, Lbol, associated with the accretion flow. This Letter presents the first extreme ultraviolet (EUV) spectrum of a kinetically dominated quasar, 3C 270.1. The EUV continuum flux density of 3C 270.1 is very steep, F_{ν } ˜ ν ^{-α _{EUV}}, αEUV = 2.98 ± 0.15. This value is consistent with the correlation of overline{Q}/L_{bol} and αEUV found in previous studies of the EUV continuum of quasars, the EUV deficit of radio loud quasars. Curiously, although ultraviolet broad absorption line (BAL) troughs in quasar spectra are anticorrelated with overline{Q}, 3C 270.1 has been considered a BAL quasar based on an SDSS spectrum. This claim is examined in terms of the EUV spectrum of O VI and the highest resolution C IV spectrum in the archival data and the SDSS spectrum. First, from [O III]4959,5007 (IR) observations and the UV spectral lines, it is concluded that the correct redshift for 3C 270.1 is 1.5266. It is then found that the standard measure of broad absorption, BALnicity = 0, for Mg II 2800, C IV 1549 and O VI 1032 in all epochs.

  8. Photoionization capable, extreme and vacuum ultraviolet emission in developing low temperature plasmas in air

    NASA Astrophysics Data System (ADS)

    Stephens, J.; Fierro, A.; Beeson, S.; Laity, G.; Trienekens, D.; Joshi, R. P.; Dickens, J.; Neuber, A.

    2016-04-01

    Experimental observation of photoionization capable extreme ultraviolet and vacuum ultraviolet emission from nanosecond timescale, developing low temperature plasmas (i.e. streamer discharges) in atmospheric air is presented. Applying short high voltage pulses enabled the observation of the onset of plasma formation exclusively by removing the external excitation before spark development was achieved. Contrary to the common assumption that radiative transitions from the b{{}1}{{\\Pi}u} (Birge-Hopfield I) and b{{}\\prime 1}Σu+ (Birge-Hopfield II) singlet states of N2 are the primary contributors to photoionization events, these results indicate that radiative transitions from the c{{4\\prime}1}Σu+ (Carroll-Yoshino) singlet state of N2 are dominant in developing low temperature plasmas in air. In addition to c{}4\\prime transitions, photoionization capable transitions from atomic and singly ionized atomic oxygen were also observed. The inclusion of c{{4\\prime}1}Σu+ transitions into a statistical photoionization model coupled with a fluid model enabled streamer growth in the simulation of positive streamers.

  9. Design of an extreme ultraviolet spectrometer suite to characterize rapidly heated solid matter

    NASA Astrophysics Data System (ADS)

    Ivancic, S. T.; Stillman, C. R.; Nelson, D.; Begishev, I. A.; Mileham, C.; Nilson, P. M.; Froula, D. H.

    2016-11-01

    An ultrafast streaked extreme-ultraviolet (XUV) spectrometer (5-20 nm) was developed to measure the temperature dynamics in rapidly heated samples. Rapid heating makes it possible to create exotic states of matter that can be probed during their inertial confinement time—tens of picoseconds in the case of micron-sized targets. In contrast to other forms of pyrometry, where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for a temperature measurement at the material-vacuum interface. The surface-temperature measurement constrains models for the release of high-energy-density material. Coupling the XUV spectrometer to an ultrafast (<2-ps) streak camera provided picosecond-time scale evolution of the surface-layer emission. Two high-throughput XUV spectrometers were designed to simultaneously measure the time-resolved and absolute XUV emission.

  10. Design of an extreme ultraviolet spectrometer suite to characterize rapidly heated solid matter.

    PubMed

    Ivancic, S T; Stillman, C R; Nelson, D; Begishev, I A; Mileham, C; Nilson, P M; Froula, D H

    2016-11-01

    An ultrafast streaked extreme-ultraviolet (XUV) spectrometer (5-20 nm) was developed to measure the temperature dynamics in rapidly heated samples. Rapid heating makes it possible to create exotic states of matter that can be probed during their inertial confinement time-tens of picoseconds in the case of micron-sized targets. In contrast to other forms of pyrometry, where the temperature is inferred from bulk x-ray emission, XUV emission is restricted to the sample surface, allowing for a temperature measurement at the material-vacuum interface. The surface-temperature measurement constrains models for the release of high-energy-density material. Coupling the XUV spectrometer to an ultrafast (<2-ps) streak camera provided picosecond-time scale evolution of the surface-layer emission. Two high-throughput XUV spectrometers were designed to simultaneously measure the time-resolved and absolute XUV emission.

  11. Extreme ultraviolet spectroscopy and atomic models of highly charged heavy ions in the Large Helical Device

    NASA Astrophysics Data System (ADS)

    Suzuki, C.; Murakami, I.; Koike, F.; Tamura, N.; Sakaue, H. A.; Morita, S.; Goto, M.; Kato, D.; Ohashi, H.; Higashiguchi, T.; Sudo, S.; O'Sullivan, G.

    2017-01-01

    We report recent results of extreme ultraviolet (EUV) spectroscopy of highly charged heavy ions in plasmas produced in the Large Helical Device (LHD). The LHD is an ideal source of experimental databases of EUV spectra because of high brightness and low opacity, combined with the availability of pellet injection systems and reliable diagnostic tools. The measured heavy elements include tungsten, tin, lanthanides and bismuth, which are motivated by ITER as well as a variety of plasma applications such as EUV lithography and biological microscopy. The observed spectral features drastically change between quasicontinuum and discrete depending on the plasma temperature, which leads to some new experimental identifications of spectral lines. We have developed collisional-radiative models for some of these ions based on the measurements. The atomic number dependence of the spectral feature is also discussed.

  12. Extreme Ultraviolet Solar Images Televised In-Flight with a Rocket-Borne SEC Vidicon System.

    PubMed

    Tousey, R; Limansky, I

    1972-05-01

    A TV image of the entire sun while an importance 2N solar flare was in progress was recorded in the extreme ultraviolet (XUV) radiation band 171-630 A and transmitted to ground from an Aerobee-150 rocket on 4 November 1969 using S-band telemetry. The camera tube was a Westinghouse Electric Corporation SEC vidicon, with its fiber optic faceplate coated with an XUV to visible conversion layer of p-quaterphenyl. The XUV passband was produced by three 1000-A thick aluminum filters in series together with the platinized reflecting surface of the off-axis paraboloid that imaged the sun. A number of images were recorded with integration times between 1/30 see and 2 sec. Reconstruction of pictures was enhanced by combining several to reduce the noise.

  13. Modification of organosilicate glasses low-k films under extreme and vacuum ultraviolet radiation

    NASA Astrophysics Data System (ADS)

    Rakhimova, T. V.; Rakhimov, A. T.; Mankelevich, Yu. A.; Lopaev, D. V.; Kovalev, A. S.; Vasil'eva, A. N.; Proshina, O. V.; Braginsky, O. V.; Zyryanov, S. M.; Kurchikov, K.; Novikova, N. N.; Baklanov, M. R.

    2013-03-01

    Degradation of chemical composition of porous low-k films under extreme and various vacuum ultraviolet emissions is studied using specially developed sources. It is shown that the most significant damage is induced by Xe line emission (147 nm) in comparison with Ar (106 nm), He (58 nm), and Sn (13.5 nm) emissions. No direct damage was detected for 193 nm emission. Photoabsorption cross-sections and photodissociation quantum yields were derived for four films under study. 147 nm photons penetrate deeply into low-k films due to smaller photoabsorption cross-section and still have sufficient energy to excite Si-O-Si matrix and break Si-CH3 bonds.

  14. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

    DOEpatents

    Kublak, G.D.; Richardson, M.C.

    1996-11-19

    Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

  15. Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithography

    DOEpatents

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.

    2004-11-23

    A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.

  16. Study of an astronomical extreme ultraviolet rocket spectrometer for use on shuttle missions

    NASA Technical Reports Server (NTRS)

    Bowyer, C. S.

    1977-01-01

    The adaptation of an extreme ultraviolet astronomy rocket payload for flight on the shuttle was studied. A sample payload for determining integration and flight procedures for experiments which may typically be flown on shuttle missions was provided. The electrical, mechanical, thermal, and operational interface requirements between the payload and the orbiter were examined. Of particular concern was establishing a baseline payload accommodation which utilizes proven common hardware for electrical, data, command, and possibly real time monitoring functions. The instrument integration and checkout procedures necessary to assure satisfactory in-orbit instrument performance were defined and those procedures which can be implemented in such a way as to minimize their impact on orbiter integration schedules were identified.

  17. Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

    NASA Astrophysics Data System (ADS)

    Harada, Tetsuo; Hashimoto, Hiraku; Amano, Tsuyoshi; Kinoshita, Hiroo; Watanabe, Takeo

    2016-04-01

    To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro-coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140 nm focus diameter on the defect using a Fresnel zone plate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect are reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. The micro-CSM is a very powerful tool to review an EUV phase defect.

  18. A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

    NASA Astrophysics Data System (ADS)

    Wachulak, P. W.; Torrisi, A.; Bartnik, A.; Węgrzyński, Ł.; Fok, T.; Fiedorowicz, H.

    2017-01-01

    A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25-75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.

  19. Note: Thermally stable thin-film filters for high-power extreme-ultraviolet applications.

    PubMed

    Tarrio, C; Berg, R F; Lucatorto, T B; Lairson, B; Lopez, H; Ayers, T

    2015-11-01

    We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm(-2), Ni-mesh-backed Zr filters have a typical lifetime of 20 h, at which point they suffer from pinholes and a 50% loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters to be about 634 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 60 K. We have exposed a Si filter backed by such a mesh for more than 60 h with little loss of transmission and no leaks.

  20. Thermally stable thin-film filters for high-power extreme-ultraviolet applications

    PubMed Central

    Tarrio, C.; Berg, R. F.; Lucatorto, T. B.; Lairson, B.; Lopez, H.; Ayers, T.

    2016-01-01

    We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm−2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours, at which point they suffer from pinholes and a 50 % loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters to be about 634 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 60 K. We have exposed a Si filter backed by such a mesh for more than 60 hours with little loss of transmission and no leaks. PMID:26628184

  1. Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

    SciTech Connect

    Hara, Hiroyuki Arai, Goki; Dinh, Thanh-Hung; Higashiguchi, Takeshi; Jiang, Weihua; Miura, Taisuke; Endo, Akira; Ejima, Takeo; Li, Bowen; Dunne, Padraig; O'Sullivan, Gerry; Sunahara, Atsushi

    2015-11-21

    The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18–20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

  2. Three-dimensional nanoscale molecular imaging by extreme ultraviolet laser ablation mass spectrometry

    PubMed Central

    Kuznetsov, Ilya; Filevich, Jorge; Dong, Feng; Woolston, Mark; Chao, Weilun; Anderson, Erik H.; Bernstein, Elliot R.; Crick, Dean C.; Rocca, Jorge J.; Menoni, Carmen S.

    2015-01-01

    Analytical probes capable of mapping molecular composition at the nanoscale are of critical importance to materials research, biology and medicine. Mass spectral imaging makes it possible to visualize the spatial organization of multiple molecular components at a sample's surface. However, it is challenging for mass spectral imaging to map molecular composition in three dimensions (3D) with submicron resolution. Here we describe a mass spectral imaging method that exploits the high 3D localization of absorbed extreme ultraviolet laser light and its fundamentally distinct interaction with matter to determine molecular composition from a volume as small as 50 zl in a single laser shot. Molecular imaging with a lateral resolution of 75 nm and a depth resolution of 20 nm is demonstrated. These results open opportunities to visualize chemical composition and chemical changes in 3D at the nanoscale. PMID:25903827

  3. Observation of molecular hyperfine structure in the extreme ultraviolet: The HF C-X spectrum.

    PubMed

    Philippson, Jeffrey N; Shiell, Ralph C; Reinhold, Elmar; Ubachs, Wim

    2008-11-07

    Clearly resolved hyperfine structure has been observed in the extreme ultraviolet (XUV) spectra of the C (1)Pi, v=0-X (1)Sigma(+), v=0 transition of H(19)F obtained through 1 XUV+1 UV resonance enhanced multiphoton ionization spectroscopy. The hyperfine splitting within the R-branch lines shows significant perturbations, which we attribute to mixing with the rotational levels of the nearby v=29 level of the B (1)Sigma(+) ion-pair state. A deperturbation analysis quantitatively explains the apparent variation of the fluorine magnetic hyperfine parameter a(F), for which a value of 4034(83) MHz was obtained by averaging over the values derived from the R(0)-R(4) lines, after correcting for the effects of the perturbations.

  4. USING HINODE/EXTREME-ULTRAVIOLET IMAGING SPECTROMETER TO CONFIRM A SEISMOLOGICALLY INFERRED CORONAL TEMPERATURE

    SciTech Connect

    Marsh, M. S.; Walsh, R. W.

    2009-11-20

    The Extreme-Ultraviolet Imaging Spectrometer on board the HINODE satellite is used to examine the loop system described in Marsh et al. by applying spectroscopic diagnostic methods. A simple isothermal mapping algorithm is applied to determine where the assumption of isothermal plasma may be valid, and the emission measure locii technique is used to determine the temperature profile along the base of the loop system. It is found that, along the base, the loop has a uniform temperature profile with a mean temperature of 0.89 +- 0.09 MK which is in agreement with the temperature determined seismologically in Marsh et al., using observations interpreted as the slow magnetoacoustic mode. The results further strengthen the slow mode interpretation, propagation at a uniform sound speed, and the analysis method applied in Marsh et al. It is found that it is not possible to discriminate between the slow mode phase speed and the sound speed within the precision of the present observations.

  5. Resonant two-photon absorption of extreme-ultraviolet free-electron-laser radiation in helium

    SciTech Connect

    Nagasono, Mitsuru; Suljoti, Edlira; Pietzsch, Annette; Hennies, Franz; Wellhoefer, Michael; Hoeft, Jon-Tobias; Martins, Michael; Wurth, Wilfried; Foehlisch, Alexander; Treusch, Rolf; Feldhaus, Josef; Schneider, Jochen R.

    2007-05-15

    We have investigated the nonlinear response of helium to intense extreme-ultraviolet radiation from the free-electron laser in Hamburg (FLASH). We observe a spectral feature between 24 and 26 eV electron kinetic energy in photoemission which shows a quadratic fluence dependence. The feature is explained as a result of subsequent processes involving a resonant two-photon absorption process into doubly excited levels of even parity (N=5 and 6), radiative decay to the doubly excited states in the vicinity of the He{sup +} (N=2) ionization threshold and finally the photoionization of the inner electron by the radiation of the next microbunches. This observation suggests that even-parity states, which have been elusive to be measured with the low pulse energy of synchrotron radiation sources, can be investigated with the intense radiation of FLASH. This also demonstrates a first step to bring nonlinear spectroscopy into the xuv and soft-x-ray regime.

  6. Contamination control program results from three years of ground operations on the Extreme Ultraviolet Explorer instruments

    NASA Technical Reports Server (NTRS)

    Ray, David C.; Jelinsky, Sharon; Welsh, Barry Y.; Malina, Roger F.

    1990-01-01

    A stringent contamination-control plan has been developed for the optical components of the Extreme Ultraviolet Explorer instruments, whose performance in the 80-900 A wavelength range is highly sensitive to particulate and molecular contamination. The contamination-control program has been implemented over the last three years during assembly, test and calibration phases of the instrument. These phases have now been completed and the optics cavities of the instruments have been sealed until deployment in space. Various approaches are discussed which have been used during ground operations to meet optics' contamination goals within the project schedule and budget. The measured optical properties of EUV witness mirrors are also presented which remained with the flight mirrors during ground operations. These were used to track optical degradation due to contamination from the cleanroom and high-vacuum test-chamber environments.

  7. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    DOE PAGES

    Li, Zheng; Vendrell, Oriol

    2016-01-13

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. As a result, for situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20more » to 40 fs driven by strong non-adiabatic effects.« less

  8. Contamination control program results from three years of ground operations on the Extreme Ultraviolet Explorer instruments

    NASA Technical Reports Server (NTRS)

    Ray, David C.; Jelinsky, Sharon; Welsh, Barry Y.; Malina, Roger F.

    1990-01-01

    A stringent contamination-control plan has been developed for the optical components of the Extreme Ultraviolet Explorer instruments, whose performance in the 80-900 A wavelength range is highly sensitive to particulate and molecular contamination. The contamination-control program has been implemented over the last three years during assembly, test and calibration phases of the instrument. These phases have now been completed and the optics cavities of the instruments have been sealed until deployment in space. Various approaches are discussed which have been used during ground operations to meet optics' contamination goals within the project schedule and budget. The measured optical properties of EUV witness mirrors are also presented which remained with the flight mirrors during ground operations. These were used to track optical degradation due to contamination from the cleanroom and high-vacuum test-chamber environments.

  9. Data processing and initial results from the CE-3 Extreme Ultraviolet Camera

    NASA Astrophysics Data System (ADS)

    Feng, Jian-Qing; Liu, Jian-Jun; He, Fei; Yan, Wei; Ren, Xin; Tan, Xu; He, Ling-Ping; Chen, Bo; Zuo, Wei; Wen, Wei-Bin; Su, Yan; Zou, Yong-Liao; Li, Chun-Lai

    2014-12-01

    The Extreme Ultraviolet Camera (EUVC) onboard the Chang'e-3 (CE-3) lander is used to observe the structure and dynamics of Earth's plasmasphere from the Moon. By detecting the resonance line emission of helium ions (He+) at 30.4 nm, the EUVC images the entire plasmasphere with a time resolution of 10 min and a spatial resolution of about 0.1 Earth radius (RE) in a single frame. We first present details about the data processing from EUVC and the data acquisition in the commissioning phase, and then report some initial results, which reflect the basic features of the plasmasphere well. The photon count and emission intensity of EUVC are consistent with previous observations and models, which indicate that the EUVC works normally and can provide high quality data for future studies.

  10. Interplay of electron heating and saturable absorption in ultrafast extreme ultraviolet transmission of condensed matter

    NASA Astrophysics Data System (ADS)

    Di Cicco, Andrea; Hatada, Keisuke; Giangrisostomi, Erika; Gunnella, Roberto; Bencivenga, Filippo; Principi, Emiliano; Masciovecchio, Claudio; Filipponi, Adriano

    2014-12-01

    High intensity pulses obtained by modern extreme ultraviolet (EUV) and x-ray photon sources allows the observation of peculiar phenomena in condensed matter. Experiments performed at the Fermi@Elettra FEL-1 free-electron-laser source at 23.7, 33.5, and 37.5 eV on Al thin films, for an intermediate-fluence range up to about 20 J /cm2, show evidence for a nonmonotonic EUV transmission trend. A decreasing transmission up to about 5 -10 J /cm2 is followed by an increase at higher fluence, associated with saturable absorption effects. The present findings are interpreted within a simplified three-channel model, showing that an account of the interplay between ultrafast electron heating and saturation effects is required to explain the observed transmission trend.

  11. Design and performance of the telescope and detector covers on the Extreme Ultraviolet Explorer satellite

    NASA Technical Reports Server (NTRS)

    Tom, James L.

    1994-01-01

    Two cover mechanisms were designed and developed for the Extreme Ultraviolet Explorer (EUVE) science payload to keep the EUVE telescope mirrors and detectors sealed from the atmospheric environment until the spacecraft was placed into orbit. There were four telescope front covers and seven motorized detector covers on the EUVE science payload. The EUVE satellite was launched into orbit in June 1992 and all the covers operated successfully after launch. This success can be attributed to high design margins and extensive testing at each level of assembly. This paper described the design of the telescope front covers and the motorized detector covers. This paper also discusses some of the many design considerations and modifications made as performance and reliability problems became apparent from each phase of testing.

  12. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization

    SciTech Connect

    Li, Zheng; Vendrell, Oriol

    2016-01-13

    The ultrafast nuclear and electronic dynamics of protonated water clusters H+(H2O)n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. As a result, for situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects.

  13. Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration

    NASA Astrophysics Data System (ADS)

    Liu, Yan; Li, Yanqiu

    2016-09-01

    At present, few projection objectives for extreme ultraviolet (EUV) lithography pay attention to correct thermal aberration in optical design phase, which would lead to poor image quality in a practical working environment. We present an aspherical modification method for helping the EUV lithographic objective additionally correct the thermal aberration. Based on the thermal aberration and deformation predicted by integrated optomechanical analysis, the aspherical surfaces in an objective are modified by an iterative algorithm. The modified aspherical surfaces could correct the thermal aberration and maintain the initial high image quality in a practical working environment. A six-mirror EUV lithographic objective with 0.33-numerical aperture is taken as an example to illustrate the presented method. The results show that the thermal aberration can be corrected effectively, and the image quality of the thermally deformed system is improved to the initial design level, which proves the availability of the method.

  14. Intense extreme ultraviolet emission from the B star Epsilon Canis Majoris

    NASA Technical Reports Server (NTRS)

    Vallerga, John V.; Vedder, Peter W.; Welsh, Barry Y.

    1993-01-01

    We report the discovery of the brightest nonsolar source of EUV emission: the B2 II star Epsilon Canis Majoris. This source has been detected by the Extreme Ultraviolet Explorer satellite's all-sky photometric survey. It is approximately 30 times brighter at 600 A than the predicted emission from the hot white dwarf star HZ 43, previously believed to be the brightest EUV source. We have fitted a simple B star photospheric model to the observed broadband EUV fluxes to explain this emission. Assuming a stellar temperature of 25,000 K and a gravity (log g) of 3.3, we derive an interstellar hydrogen column density of 1.05 +/- 0.05 x 10 exp 18/sq cm over the 187 pc to the star. This corresponds to a line-of-sight number density of hydrogen, of 0.002/cu cm, which is comparable to values found in the rarefied Local Bubble region which surrounds the sun.

  15. Radiative heating of thin Al foils by intense extreme ultraviolet radiation

    NASA Astrophysics Data System (ADS)

    Grabovski, E. V.; Sasorov, P. V.; Shevelko, A. P.; Aleksandrov, V. V.; Andreev, S. N.; Basko, M. M.; Branitski, A. V.; Gritsuk, A. N.; Volkov, G. S.; Laukhin, Ya. N.; Mitrofanov, K. N.; Novikov, V. G.; Oleinik, G. M.; Samokhin, A. A.; Smirnov, V. P.; Tolstikhina, I. Yu.; Frolov, I. N.; Yakushev, O. F.

    2016-03-01

    The effect of induced transparency of thin Al foils radiatively heated by intense extreme ultraviolet (EVU) radiation has been observed. The radiation of the plasma of Z-pinches appearing under the compression of tungsten liners at the Angara-5-1 facility has been used as the radiation that heats the Al foil (peak illumination on the foil ~0.55 TW/cm2) and is transmitted through it. The photoabsorption has been studied in the formed aluminum plasma at temperatures of ~10-30 eV in the density range of ~1-20 mg/cm3 in the wavelength range of ~5-24 nm. Absorption lines of Al4+...7+ ions have been identified in the experimental spectrum. In addition, radiative gas-dynamic simulations of the foil heating and expansion have been performed taking into account radiation transfer processes.

  16. Carbon contamination of extreme ultraviolet (EUV) mask and its effect on imaging

    SciTech Connect

    Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Garg, Rashi; Thomas, Petros; Mbanaso, Chimaobi; Wuest, Andreas; Goodwin, Frank; Huh, Sungmin; Naulleau, Patrick; Goldlberg, Kenneth; Mochi, Iacopo; Denbeaux, Gregory

    2009-02-02

    Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

  17. The ion microscope as a tool for quantitative measurements in the extreme ultraviolet

    PubMed Central

    Tsatrafyllis, N.; Bergues, B.; Schröder, H.; Veisz, L.; Skantzakis, E.; Gray, D.; Bodi, B.; Kuhn, S.; Tsakiris, G. D.; Charalambidis, D.; Tzallas, P.

    2016-01-01

    We demonstrate a tool for quantitative measurements in the extreme ultraviolet (EUV) spectral region measuring spatially resolved atomic ionization products at the focus of an EUV beam. The ionizing radiation is a comb of the 11th–15th harmonics of a Ti:Sapphire femtosecond laser beam produced in a Xenon gas jet. The spatial ion distribution at the focus of the harmonics is recorded using an ion microscope. Spatially resolved single- and two-photon ionization products of Argon and Helium are observed. From such ion distributions single- and two-photon generalized cross sections can be extracted by a self-calibrating method. The observation of spatially resolved two-EUV-photon ionization constitutes an initial step towards future single-shot temporal characterization of attosecond pulses. PMID:26868370

  18. Absolute sensitivity calibration of an extreme ultraviolet spectrometer for tokamak measurements

    NASA Astrophysics Data System (ADS)

    Guirlet, R.; Schwob, J. L.; Meyer, O.; Vartanian, S.

    2017-01-01

    An extreme ultraviolet spectrometer installed on the Tore Supra tokamak has been calibrated in absolute units of brightness in the range 10-340 Å. This has been performed by means of a combination of techniques. The range 10-113 Å was absolutely calibrated by using an ultrasoft-X ray source emitting six spectral lines in this range. The calibration transfer to the range 113-182 Å was performed using the spectral line intensity branching ratio method. The range 182-340 Å was calibrated thanks to radiative-collisional modelling of spectral line intensity ratios. The maximum sensitivity of the spectrometer was found to lie around 100 Å. Around this wavelength, the sensitivity is fairly flat in a 80 Å wide interval. The spatial variations of sensitivity along the detector assembly were also measured. The observed trend is related to the quantum efficiency decrease as the angle of the incoming photon trajectories becomes more grazing.

  19. Electron-Impact-Induced Emission Cross Sections of Neon in the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Kanik, I.; Ajello, J. M.; James, G. K.

    1996-01-01

    We have measured the extreme ultraviolet (EUV) spectrum of neon produced by electron excitation. The measurements were obtained under optically thin conditions, and at a spectral resolution of 0.5 nm full width at half maximum (FWHM). The most prominent features of the EUV spectrum between 45-80 nm are the resonance lines of Ne I at 73.6 and 74.4 nm and a multiplet of Ne II at 46.14 nm (the average value for the line center of the two closely spaced ion lines at 46.07 and 46.22 nm). Absolute emission cross sections of these lines at 300 eV were measured and compared to other previous measurements.

  20. NRL-ATM extreme ultraviolet solar image TV monitor flown on Skylab

    NASA Technical Reports Server (NTRS)

    Crockett, W. R.; Purcell, J. D.; Schumacher, R. J.; Tousey, R.; Patterson, N. P.

    1977-01-01

    An instrument for recording extreme ultraviolet television images of the sun was flown in the Apollo Telescope Mount on Skylab. Solar radiation in the 171-630 A wavelength range, defined by the transmission band of three thin-film aluminum filters, was focused onto a p-quaterphenyl photon conversion layer by a platinum-coated mirror at normal incidence. The conversion layer was attached to the faceplate of a low light level SEC vidicon. An onboard video monitor enabled the Skylab crews to observe the images in real-time and to identify and follow the development of solar features. Images were also transmitted to the mission control center, where they were used in planning the ATM observing schedule.

  1. Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics.

    PubMed

    Qiu, Huatan; Srivastava, Shailendra N; Thompson, Keith C; Neumann, Martin J; Ruzic, David N

    2008-05-01

    Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the surface chemistry causing the mirrors to suffer less damage, is crucial for this technology development. A Mo-Au Gibbsian segregation (GS) alloy is deposited on Si using a dc dual-magnetron cosputtering system and the damage is investigated as a result of time dependent exposure in an EUV source. A thin Au segregating layer is maintained through segregation during exposure, even though overall erosion in the Mo-Au sample is taking place in the bulk. The reflective material, Mo, underneath the segregating layer is protected by this sacrificial layer, which is lost due to preferential sputtering. In addition to theoretical work, experimental results are presented on the effectiveness of the GS alloys to be used as potential EUV collector optics material.

  2. Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source.

    PubMed

    Hansson, Björn A M; Mosesson, Sofia; Hertz, Hans M

    2004-10-10

    Many modern compact soft-x-ray and extreme-ultraviolet (EUV) imaging systems operate with small fields of view and therefore benefit from the use of small high-brightness sources. Such systems include water-window microscopes and EUV lithography tools. We show that the photon losses in such systems can be minimized while uniformity of object-plane illumination is maintained by controlled scanning of the source. The improved collection efficiency is demonstrated both theoretically and experimentally for a scanned laser-plasma source compared with static sources. A prospective aerial image microscope and a liquid-xenon-jet laser-plasma source are offered as examples of modern imaging tools that may benefit from such scanning of the source.

  3. The expansion velocities of laser-produced plasmas determined from extreme ultraviolet spectral line profiles

    NASA Technical Reports Server (NTRS)

    Feldman, U.; Doschek, G. A.; Behring, W. E.; Cohen, L.

    1977-01-01

    The expansion of laser-produced plasma is determined from the shapes of spectral lines of highly ionized iron emitted in the extreme ultraviolet. The plasmas were produced by focusing the pulse from a Nd:glass laser onto solid planar targets, and spectra were recorded with a high-resolution grazing-incidence spectrograph. From the Doppler broadening of lines of Fe XX and Fe XXI, expansion velocities of about 830 km/s were determined. The relative time-averaged ion abundances of Fe XVIII, Fe XIX, Fe XX, and Fe XXI are estimated for three different spectra. The abundances do not differ by more than a factor of 4 for any of the spectra.

  4. Extreme ultraviolet amplifier experiments at the LLNL Nova two-beam facility (abstract)

    NASA Astrophysics Data System (ADS)

    Shimkaveg, G.

    1990-10-01

    We present the results of our most recent experiments on extreme ultraviolet (XUV) and soft x-ray amplifiers conducted at LLNL's Nova laser two-beam facility. Of particular interest are high-Z nickel-like amplifiers which have demonstrated gain at photon energies above the carbon K edge, sub-Doppler-resolution spectra of amplified lines from long selenium amplifiers, absolutely timed streaked XUV and x-ray spectra from germanium amplifiers at a variety of L-shell ionization states, and gain measurements from neon-like silver amplifiers. The array of spectroscopic instruments utilized in these experiments will be described in detail. This work was performed under the auspices of the U.S. Department of Energy by the Lawrence Livermore National Laboratory under contract W-7405-ENG-48.

  5. A solar extreme ultraviolet telescope and spectrograph for space shuttle. Volume 1: Investigation and technical plan

    NASA Technical Reports Server (NTRS)

    Neupert, W. M.

    1978-01-01

    A scientific investigation of heating and mass transport in the solar corona that is currently planned for a future Shuttle/Spacelab flight is outlined. The instrument to be used is a near-normal incidence grating spectrograph fed by a grazing incidence Wolter Type 2 telescope. A toroidal grating design provides stigmatic images of the corona up to 8 arc min in extent over the spectral region from 225 A to 370 A. Spatial resolution of at least 2 arc sec and spectral resolution of 0.050 A is achievable throughout the central 4 arc min field or view. Primary scientific data are recorded on Schumann-type film. An H-alpha slit jaw monitor and zero order extreme ultraviolet monitor are also planned to support instrument operation.

  6. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption.

    PubMed

    Sun, J Q; Cheng, X; Ding, M D; Guo, Y; Priest, E R; Parnell, C E; Edwards, S J; Zhang, J; Chen, P F; Fang, C

    2015-06-26

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin.

  7. Limitations in photoionization of helium by an extreme ultraviolet optical vortex

    NASA Astrophysics Data System (ADS)

    Kaneyasu, T.; Hikosaka, Y.; Fujimoto, M.; Konomi, T.; Katoh, M.; Iwayama, H.; Shigemasa, E.

    2017-02-01

    Photoelectron angular distributions from helium atoms are measured using the circularly polarized extreme ultraviolet (XUV) vortex produced by a helical undulator as the higher harmonics of its radiation. The XUV vortex has a helical wave front and carries orbital angular momentum as well as the spin angular momentum associated with its circular polarization. While the violation of the electric dipole transition rules has been predicted for interactions between vortices and atoms, the photoelectron angular distributions are well reproduced by assuming electric dipole transitions only. This observation can be explained by the localized nature of the helical phase effect of the vortex on the interaction with atoms, and demonstrates that nondipole interactions induced by the XUV vortex are hardly observable in conventional gas-phase experiments.

  8. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    NASA Astrophysics Data System (ADS)

    Ahad, Inam Ul; Butruk, Beata; Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Ciach, Tomasz; Brabazon, Dermot

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser-plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  9. Correlated proton-electron hole dynamics in protonated water clusters upon extreme ultraviolet photoionization.

    PubMed

    Li, Zheng; Vendrell, Oriol

    2016-07-01

    The ultrafast nuclear and electronic dynamics of protonated water clusters H(+)(H2O) n after extreme ultraviolet photoionization is investigated. In particular, we focus on cluster cations with n = 3, 6, and 21. Upon ionization, two positive charges are present in the cluster related to the excess proton and the missing electron, respectively. A correlation is found between the cluster's geometrical conformation and initial electronic energy with the size of the final fragments produced. For situations in which the electron hole and proton are initially spatially close, the two entities become correlated and separate in a time-scale of 20 to 40 fs driven by strong non-adiabatic effects.

  10. Electron-Impact-Induced Emission Cross Sections of Neon in the Extreme Ultraviolet

    NASA Technical Reports Server (NTRS)

    Kanik, I.; Ajello, J. M.; James, G. K.

    1996-01-01

    We have measured the extreme ultraviolet (EUV) spectrum of neon produced by electron excitation. The measurements were obtained under optically thin conditions, and at a spectral resolution of 0.5 nm full width at half maximum (FWHM). The most prominent features of the EUV spectrum between 45-80 nm are the resonance lines of Ne I at 73.6 and 74.4 nm and a multiplet of Ne II at 46.14 nm (the average value for the line center of the two closely spaced ion lines at 46.07 and 46.22 nm). Absolute emission cross sections of these lines at 300 eV were measured and compared to other previous measurements.

  11. Extreme Ultra-Violet Spectroscopy of the Lower Solar Atmosphere During Solar Flares (Invited Review)

    NASA Astrophysics Data System (ADS)

    Milligan, Ryan O.

    2015-12-01

    The extreme ultra-violet (EUV) portion of the solar spectrum contains a wealth of diagnostic tools for probing the lower solar atmosphere in response to an injection of energy, particularly during the impulsive phase of solar flares. These include temperature- and density-sensitive line ratios, Doppler-shifted emission lines, nonthermal broadening, abundance measurements, differential emission measure profiles, continuum temperatures and energetics, among others. In this article I review some of the recent advances that have been made using these techniques to infer physical properties of heated plasma at footpoint and ribbon locations during the initial stages of solar flares. I primarily focus on studies that have utilised spectroscopic EUV data from Hinode/EUV Imaging Spectrometer (EIS) and Solar Dynamics Observatory/EUV Variability Experiment (SDO/EVE), and I also provide some historical background and a summary of future spectroscopic instrumentation.

  12. Extreme ultraviolet diagnosis of a neutral-beam-heated mirror machine

    SciTech Connect

    Drake, R.P.

    1980-07-01

    Extreme ultraviolet emissions from the LLL 2XIIB fusion research experiment have been studied. (2XIIB was a magnetic-mirror-plasma-confinement device; beams of high-energy (20 keV) neutral deuterium created a high-density, high-temperature plasma.) A normal-incidence concave-grating monochromator, equipped with a windowless photomultiplier tube, was used to measure emissions in the spectral region from 400 Angstrom to 1600 A. Emissions of oxygen, titanium, carbon, nitrogen, and deuterium were identified; the oxygen brightnesses at times exceeded 10/sup 18/ ph-s/sup -1/-cm/sup -2/-sr/sup -1/. A survey of the emission characteristics found the oxygen concentration was 3%, the other impurities had concentrations near 0.4%. The radiated power loss was about 5% of the deposited neutral beam power.

  13. Minimization of the shadow patterns produced by periodic mesh grids in extreme ultraviolet telescopes.

    PubMed

    Auchère, Frédéric; Rizzi, Julien; Philippon, Anne; Rochus, Pierre

    2011-01-01

    Thin metallic films are used as passband filters in space telescopes operating in the extreme ultraviolet (EUV). Because of their thinness, typically 100 to 200 nm, they are very sensitive to static pressure differentials and to mechanic and acoustic vibrations. Therefore, they are difficult to manage in all phases of a space program, from manufacturing to vacuum testing to launch. A common solution to this problem is to reinforce them with fine mesh grids with pitches ranging from a few hundred micrometers to a few millimeters. Depending on their location in the optical path, the main effect of these periodic grids is either to diffract light or to cast penumbral shadows on the focal plane. In this paper, we analyze the formation of the shadow modulation patterns and derive design rules to minimize their amplitude. The minimization principle is illustrated by an application to a solar EUV telescope.

  14. Analysis of extreme-ultraviolet observations of a polar coronal hole

    NASA Technical Reports Server (NTRS)

    Mariska, J. T.

    1978-01-01

    Emission gradient curves for extreme-ultraviolet resonance lines of lithiumlike ions have been constructed from spectroheliograms of a northern polar coronal hole observed on August 14, 1973, with the Harvard experiment on Skylab. An emission-measure analysis indicates both reduced density and coronal temperature in the coronal hole. The boundary geometry of the coronal hole is determined, and a temperature-density model that is consistent with the observed intensities is constructed. The model gives a conductive flux of 60,000 erg/sq cm per sec at 1.03 solar radii. The boundary geometry and density distribution are combined with typical solar-wind parameters at the earth to determine an outflow velocity of 15 km/s at 1.08 solar radii.

  15. Invisible marking system by extreme ultraviolet radiation: the new frontier for anti-counterfeiting tags

    NASA Astrophysics Data System (ADS)

    Di Lazzaro, P.; Bollanti, S.; Flora, F.; Mezi, L.; Murra, D.; Torre, A.; Bonfigli, F.; Montereali, R. M.; Vincenti, M. A.

    2016-07-01

    We present a marking technology which uses extreme ultraviolet radiation to write invisible patterns on tags based on alkali fluoride thin films. The shape of the pattern is pre-determined by a mask (in the case of contact lithography) or by a suitable mirror (projection lithography). Tags marked using this method offer a much better protection against fakes than currently available anti-counterfeiting techniques. The complexity and cost of this technology can be tailored to the value of the good to be protected, leaving, on the other hand, the specific reading technique straightforward. So far, we have exploited our invisible marking to tag artworks, identity cards, electrical components, and containers of radioactive wastes. Advantages and limits of this technology are discussed in comparison with the anti-counterfeiting systems available in the market.

  16. Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

    SciTech Connect

    Naulleau, Patrick; Anderson, Christopher N.; Chiu, Jerrin; Dean, Kim; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Hoef, Brian; Jones, Gideon; Koh, Chawon; La Fontaine, Bruno; Ma, Andy; Montgomery, Warren; Niakoula, Dimitra; Park, Joo-On; Wallow, Tom; Wurm, Stefan

    2008-09-02

    Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. One of these tools is the 0.3 numerical aperture SEMATECH Berkeley MET operating as a resist and mask test center. Here they present an update on the tool summarizing some of the latest test and characterization results. they provide an update on the long-term aberration stability of the tool and present line-space imaging in chemically amplified photoresist down to the 20-nm half-pitch level. Although resist development has shown substantial progress in the area of resolution, line-edge-roughness (LER) remains a significant concern. Here we present a summary of recent LER performance results and consider the effect of mask contributors to the LER observed from the SEMATECH Berkeley microfield tool.

  17. Photolithography reaches 6 nm half-pitch using extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Fan, Daniel; Ekinci, Yasin

    2016-07-01

    Extreme ultraviolet interference lithography records the interference pattern of two diffracted, coherent light beams, where the pattern resolution is half the diffraction grating resolution. The fabrication of diffraction grating masks by e-beam lithography is restricted by the electron proximity effect and pattern transfer limitations into diffraction efficient materials. By patterning HSQ lines at a relaxed pitch to avoid the electron proximity effect, depositing conformal iridium via atomic layer deposition, followed by ion milling the top and bottom iridium and HSQ removal, we fabricated iridium diffraction gratings at double the line spacing of the original HSQ lines. Line/space patterns of 6-nm half-pitch patterns were achieved using these masks, marking a new record resolution in photolithography.

  18. Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging

    SciTech Connect

    Green, Tyler; Kuznetsov, Ilya; Willingham, David; Naes, Benjamin E.; Eiden, Gregory C.; Zhu, Zihua; Chao, W.; Rocca, Jorge J.; Menoni, Carmen S.; Duffin, Andrew M.

    2017-01-01

    The purpose of this research was to characterize Extreme Ultraviolet Time-of-Flight (EUV TOF) Laser Ablation Mass Spectrometry for high spatial resolution elemental and isotopic analysis. We compare EUV TOF results with Secondary Ionization Mass Spectrometry (SIMS) to orient the EUV TOF method within the overall field of analytical mass spectrometry. Using the well-characterized NIST 61x glasses, we show that the EUV ionization approach produces relatively few molecular ion interferences in comparison to TOF SIMS. We demonstrate that the ratio of element ion to element oxide ion is adjustable with EUV laser pulse energy and that the EUV TOF instrument has a sample utilization efficiency of 0.014%. The EUV TOF system also achieves a lateral resolution of 80 nm and we demonstrate this lateral resolution with isotopic imaging of closely spaced particles or uranium isotopic standard materials.

  19. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Technical Reports Server (NTRS)

    Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-01-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  20. X-ray and extreme ultraviolet spectroscopy on DIII-D

    DOE PAGES

    Victor, Brian S.; Allen, Steve L.; Beiersdorfer, P.; ...

    2017-06-14

    Two spectrometers were installed to measure tungsten emission in the core of DIII-D plasmas during a metal rings experimental campaign. The spectral range of the high-resolution (1340 spectral channels), variable-ruled grating X-ray and Extreme Ultraviolet Spectrometer (XEUS) extends from10–71more » $$\\dot{A}$$ . The spectral range of the second spectrometer, the Long-Wavelength Extreme Ultraviolet Spectrometer (LoWEUS), measures between 31–174$$\\dot{A}$$ . Three groups of tungsten lines were identified with XEUS: W38+-W45+ from 47–63$$\\dot{A}$$ , W27+-W35+ from 45–55$$\\dot{A}$$ , and W28+-W33+ from 16–30$$\\dot{A}$$ . Emission lines from tungsten charge states W28+, W43+, W44+, and W45+ are identified and the line amplitude is presented versus time. Peak emission of W43+-W45+ occurs between core Te=2.5-3 keV, and peak emission of W28+ occurs at core Te 1:3 keV. One group of tungsten lines, W40+-W45+, between 120–140$$\\dot{A}$$ , was identified with LoWEUS. W43+- W45+ lines measured with LoWEUS track the sawtooth cycle. Furthermore, sensitivity to the sawtooth cycle and the correlation of the peak emission with core electron temperature show that these spectrometers track the on-axis tungsten emission of DIII-D plasmas.« less

  1. Extreme ultraviolet spectroscopy and photometry of VV Puppis during a high accretion state

    NASA Technical Reports Server (NTRS)

    Vennes, Stephane; Szkody, Paula; Sion, Edward M.; Long, Knox S.

    1995-01-01

    We determine the physical properties of the accretion region of the AM Her-type binary VV Puppis using extreme ultraviolet (EUV) medium-resolution spectroscopy and photometry obtained with the Extreme Ultraviolet Explorer (EUVE) observatory. The EUV continuum from VV Pup was detected in the wavelength range from 75 to 135 A and was simultaneously recorded with the Deep Survey/Spectrometer (DS/S) imaging telescope, allowing for the extraction of an accurate light curve. VV Pup appeared to have entered a high-accretion state just prior to the pointed EUVE observations. We use the EUV light curve to infer the diameter of the accretion region (d = 220 km) assuming a hemispherical geometry and a radius of 9000 km for the white dwarf. We perform a model atmosphere analysis and, based on the light curve properties and assuming a distance of 145 pc, we derive an effective temperature of the accretion region in the range 270,000 is less than T(sub eff) is less than 360,000 K and a neutral hydrogen column density in the local interstellar medium of n(sub H) = 1.9 - 3.7 x 10(exp 19)/sq cm. The total EUV/soft X-ray energy radiated by the accretion region is approximately 3.5 x 10(exp 32) ergs/s. Our results provide a first verification of past suggestions that deep heating of the white dwarf surface produces the soft X-ray flux from the polars. We present a possible detection of O VI absortion features, and we suggest that extensive EUVE observations targeting high-accretion events may result in oxygen and heavier element abundance determination in the accretion region.

  2. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Technical Reports Server (NTRS)

    Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-01-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  3. Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

    NASA Astrophysics Data System (ADS)

    McDonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

    1994-11-01

    We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

  4. FIRST OBSERVATIONS OF A DOME-SHAPED LARGE-SCALE CORONAL EXTREME-ULTRAVIOLET WAVE

    SciTech Connect

    Veronig, A. M.; Muhr, N.; Kienreich, I. W.; Temmer, M.; Vrsnak, B.

    2010-06-10

    We present first observations of a dome-shaped large-scale extreme-ultraviolet coronal wave, recorded by the Extreme Ultraviolet Imager instrument on board STEREO-B on 2010 January 17. The main arguments that the observed structure is the wave dome (and not the coronal mass ejection, CME) are (1) the spherical form and sharpness of the dome's outer edge and the erupting CME loops observed inside the dome; (2) the low-coronal wave signatures above the limb perfectly connecting to the on-disk signatures of the wave; (3) the lateral extent of the expanding dome which is much larger than that of the coronal dimming; and (4) the associated high-frequency type II burst indicating shock formation low in the corona. The velocity of the upward expansion of the wave dome (v {approx} 650 km s{sup -1}) is larger than that of the lateral expansion of the wave (v {approx} 280 km s{sup -1}), indicating that the upward dome expansion is driven all the time, and thus depends on the CME speed, whereas in the lateral direction it is freely propagating after the CME lateral expansion stops. We also examine the evolution of the perturbation characteristics: first the perturbation profile steepens and the amplitude increases. Thereafter, the amplitude decreases with r {sup -2.5{+-}0.3}, the width broadens, and the integral below the perturbation remains constant. Our findings are consistent with the spherical expansion and decay of a weakly shocked fast-mode MHD wave.

  5. Fast resist-activation dosimetry for extreme ultra-violet lithography.

    PubMed

    Heo, Jinseok; Xu, Man; Maas, Diederik

    2017-03-06

    Due to the rather broad band emission spectrum of the extremely hot plasma in its extreme ultra-violet (EUV) source, an EUV lithography scanner also projects out-of-band vacuum- and deep-UV (OoB V/DUV) light on the photoresist on a wafer. As this type of uncontrolled and undesirable light can activate resist chemistry, it will impair the critical dimension uniformity of the patterns, especially across the borders of the fields. Hence, OoB V/DUV quantification technology is required in the pre-production phase. For this reason, the systematic characterization of the EUV-source emission spectrum and the spatial profile of the light as projected on the wafer is indispensable to sustain stable integrated circuit production with EUV lithography. This paper introduces an in-band EUV and OoB V/DUV dosimetry method that is based on enhanced energy sensitivity by resist contrast (EESRC). This dosimetry method is applied in an EUV lithography tool to quantitatively analyze the spatial distribution the resist activation by in-band EUV and OoB V/DUV light, under several exposure conditions. This pragmatic approach can replace the current best-practice of measuring the full spectrum of an EUV light source.

  6. Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node

    NASA Astrophysics Data System (ADS)

    Kim, Guk-Jin; Kim, In-Seon; Lee, Sung-Gyu; Yeung, Michael; Kim, Min-Su; Park, Jin-Goo; Oh, Hye-Keun

    2017-10-01

    Extreme ultraviolet (EUV) pellicles help in the protection of EUV masks from defects, contaminants, and particles during the exposure process. However, a single-stack EUV pellicle can be easily deformed during the exposure process; therefore, multi-stack pellicles have been proposed to minimize the deformation of an EUV pellicle. However, wrinkles can be formed in an EUV pellicle due to extremely thin thickness. In this study, we investigated the impact of these wrinkles on the transmission and critical dimension (CD) variation for the 5- and 3-nm nodes. The 5- and 3-nm nodes can be used by conventional and high numerical aperture (NA) systems, respectively. The variation in the transmission and the allowable local tilt angle of the wrinkle as a function of the wrinkle height and periodicity were calculated. A change in transmission of 2.2% resulted in a 0.2 nm variation in the CD for the anamorphic NA system (3-nm node), whereas a transmission variation of 1.6% caused a 0.2 nm CD variation in the isomorphic NA system (5-nm node).

  7. Extreme Mobility: Next Generation Tetrahedral Rovers

    NASA Astrophysics Data System (ADS)

    Clark, P. E.; Curtis, S. A.; Rilee, M. L.; Cheung, C. Y.; Wesenberg, R.; Brown, G.; Cooperrider, C.

    2007-01-01

    This paper describes the development and testing of a patented rover concept called Tetrahedral Explorer Technologies (TET), designed to provide extreme mobility and plug-and-play utility through reconfigurable addressable architecture. Here, we present the results of preliminary lab and field tests of Prototype III. Reconfigurable architecture is essential in exploration because reaching features of the great potential interest will require crossing a wide range of terrains largely inaccessible to permanently appendaged vehicles. One surface might be relatively flat and navigable, while another could be rough, variably sloping, broken, or dominated by unconsolidated debris. To be totally functional, structures must form pseudo-appendages varying in size, rate, and manner of deployment (gait) and moving at a speed approaching that of a human in rugged terrain. TET architecture is based on the tetrahedron, the basic space-filling shape, as building block. Tetrahedra are interconnected, their apices acting as nodes from which struts reversibly deploy. The tetrahedral framework acts as a simple skeletal muscular structure. Two simple robotic walker prototypes have already been developed from a single reconfigurable tetrahedron capable of tumbling. This paper presents the results of our attempts to simulate motions, improve the hardware, and develop gaits for a more evolved 12Tetrahedral Walker (Prototype 3) which high degrees of freedom locomotion commandable through a user friendly interface. Our rover is an early level mission concept, realized as an electromechanical system at present, which would allow autonomous in situ exploration of lunar sites when we return to the Moon. Such a rover could carry into inaccessible terrain an in situ analysis payload designed to provide not only details of composition of traversed terrain, but the identification of sites with resources useful for permanent bases, including water and high Ti glass.

  8. Generation of extreme ultrasonics in rainforest katydids.

    PubMed

    Montealegre-Z, Fernando; Morris, Glenn K; Mason, Andrew C

    2006-12-01

    The calling song of an undescribed Meconematinae katydid (Tettigoniidae) from South America consists of trains of short, separated pure-tone sound pulses at 129 kHz (the highest calling note produced by an Arthropod). Paradoxically, these extremely high-frequency sound waves are produced by a low-velocity movement of the stridulatory forewings. Sound production during a wing stroke is pulsed, but the wings do not pause in their closing, requiring that the scraper, in its travel along the file, must do so to create the pulses. We hypothesize that during scraper pauses, the cuticle behind the scraper is bent by the ongoing relative displacement of the wings, storing deformation energy. When the scraper slips free it unbends while being carried along the file and its deformation energy contributes to a more powerful, higher-rate, one-tooth one-wave sound pulse, lasting no more than a few waves at 129 000 Hz. Some other katydid species make pure-tone ultrasonic pulses. Wing velocities and carriers among these pure-tone species fall into two groups: (1) species with ultrasonic carriers below 40 kHz that have higher calling frequencies correlated with higher wing-closing velocities and higher tooth densities: for these katydids the relationship between average tooth strike rate and song frequency approaches 1:1, as in cricket escapement mechanisms; (2) a group of species with ultrasonic carriers above 40 kHz (that includes the Meconematinae): for these katydids closing wing velocities are dramatically lower and they make short trains of pulses, with intervening periods of silence greater than the duration of the pulses they separate. This signal form may be the signature of scraper-stored elastic energy.

  9. Co-Alignment System (CAS) study. Report on task 1-3. [Solar Extreme Ultraviolet Telescope and Spectrometer pointing system

    NASA Technical Reports Server (NTRS)

    Anderson, N. T.

    1980-01-01

    The design of a suitable coalignment system (CAS) for the Solar Extreme Ultraviolet Telescope and Spectrometer (SEUTS) is presented. The CAS provides offset adjustment capabilities to SEUTS which will be mounted on a single large pointing system with other devices. The suitability of existing designs is determined and modifications are suggested.

  10. LONG-TERM (SOLAR CYCLE) VARIATION OF THE EXTREME ULTRAVIOLET RADIATION AND 10.7CENTIMETER FLUX FROM THE SUN.

    DTIC Science & Technology

    The proposal is made that the 10.7-cm flux from the sun , generally regarded as a good index of the solar extreme ultraviolet radiation (EUV), does...in some degree, since many features of the sun vary with the solar cycle. With regard to the radio waves represented by the flux and optical

  11. Uncovering new thermal and mechanical behavior at the nanoscale using coherent extreme ultraviolet light

    NASA Astrophysics Data System (ADS)

    Hoogeboom-Pot, Kathleen Marie

    Tremendous recent progress in nanofabrication capabilities has made high-quality single-atomic layers and nanostructures with dimensions well below 50 nm commonplace, enabling unprecedented access to materials at the nanoscale. However, tools and techniques capable of characterizing the properties and function of nanosystems are still quite limited, leaving much of the fundamental physics that dominates material behavior in the deep nano-regime still unknown. Further understanding gained by studying nanoscale materials is critical both to fundamental science and to continued technological development. This thesis applies coherent extreme ultraviolet (EUV) light from tabletop high harmonic generation to study nanoscale systems on their intrinsic length and time scales (nanometers and femtoseconds, and above), specifically following thermal transport and acoustic dynamics. These studies have shown where and how nanostructured material properties can be quite different from their bulk counterparts. This has in turn allowed us to develop new theoretical descriptions to guide further work. By observing heat dissipation from the smallest nanostructure heat sources measured to date (at 20 nm in lateral size), this work uncovers a previously unobserved and unpredicted nanoscale thermal transport regime where both size and spacing of heat sources play a role in determining the heat dissipation effciency. Surprisingly, this shows that nanoscale heat sources can cool more quickly when spaced close together than when far apart. This discovery is significant to the engineering of thermal management in nanoscale systems and devices while also revealing new insight into the fundamental nature of thermal transport. Furthermore, we harness this new regime to demonstrate the first experimental measurement of the differential contributions of phonons with different mean free paths to thermal conductivity, down to mean free paths as short as 14 nm for the first time. The same

  12. Extreme events in excitable systems and mechanisms of their generation.

    PubMed

    Ansmann, Gerrit; Karnatak, Rajat; Lehnertz, Klaus; Feudel, Ulrike

    2013-11-01

    We study deterministic systems, composed of excitable units of FitzHugh-Nagumo type, that are capable of self-generating and self-terminating strong deviations from their regular dynamics without the influence of noise or parameter change. These deviations are rare, short-lasting, and recurrent and can therefore be regarded as extreme events. Employing a range of methods we analyze dynamical properties of the systems, identifying features in the systems' dynamics that may qualify as precursors to extreme events. We investigate these features and elucidate mechanisms that may be responsible for the generation of the extreme events.

  13. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemysław; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Mirosław; Adjei, Daniel; Ahad, Inam Ul; Ayele, Mesfin G.; Fok, Tomasz; Szczurek, Anna; Torrisi, Alfio; Wegrzyński, Łukasz; Fiedorowicz, Henryk

    2015-05-01

    Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for application in various areas of technology and science are presented. The sources are based on a laser-irradiated gas puff target approach. The targets formed by pulsed injection of gas under high-pressure are irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating pulses with time duration from 1ns to 10ns and energies from 0.5J to 10J at 10Hz repetition rate. The gas puff targets are produced using a double valve system equipped with a special nozzle to form a double-stream gas puff target which secures high conversion efficiency without degradation of the nozzle. The use of a gas puff target instead of a solid target makes generation of laser plasmas emitting soft x-rays and EUV possible without target debris production. The sources are equipped with various optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, a "lobster eye" type grazing incidence multi-foil mirror, and an ellipsoidal mirror with Mo/Si multilayer coating, to collect soft x-ray and EUV radiation and form the radiation beams. In this paper new applications of these sources in various fields, including soft x-ray and EUV imaging in nanoscale, EUV radiography and tomography, EUV materials processing and modification of polymer surfaces, EUV photoionization of gases, radiobiology and soft x-ray contact microscopy are reviewed.

  14. The Limb-Imaging Ionospheric and Thermospheric Extreme-Ultraviolet Spectrograph (LITES) on the ISS

    NASA Astrophysics Data System (ADS)

    Stephan, Andrew W.; Finn, Susanna C.; Cook, Timothy A.; Chakrabarti, Supriya; Budzien, Scott A.

    2015-04-01

    The Limb-imaging Ionospheric and Thermospheric Extreme-ultraviolet Spectrograph (LITES) is being prepared for flight in early 2016 aboard the Space Test Program Houston 5 (STP-H5) experiment pallet to the International Space Station (ISS). LITES is an imaging spectrograph that spans 60-140 nm and will obtain limb profiles of the ionosphere, along with the key upper atmospheric constituents O and N2. During the day, LITES measures the OII 83.4 and 61.7 nm emissions that are produced by solar photoionization of atomic oxygen in the lower thermosphere. The 83.4 nm emission is resonantly scattered by ionospheric O+, and thus its altitude profile is formed by both the initial ionization brightness and the ionospheric content. The 61.7 nm emission is not scattered and is used to constrain the photoionization brightness in the retrieval. At night, recombination of O+ and electrons produces optically thin emissions at 91.1 and 135.6 nm that are used to tomographically reconstruct the two-dimensional ionosphere in the orbital plane.These observations will be complemented and validated by ground-based data from an international network of digisondes, visible spectrographs, and imagers, which will provide ground truth for the space-based measurements. Additionally, the STP-H5 mission includes the GPS Radio Occultation and Ultraviolet Photometer Co-located (GROUP-C) experiment that consists of a high-sensitivity, nadir-viewing photometer that measures the nighttime ionospheric airglow at 135.6 nm, and a GPS receiver that measures ionospheric electron content and scintillation. We will discuss the LITES measurements and science goals, and how LITES data will be combined with these other experiments to study low and middle latitude ionospheric structures on a global scale.

  15. The High-resolution Extreme-ultraviolet Spectrum of N2 by Electron Impact

    NASA Astrophysics Data System (ADS)

    Heays, A. N.; Ajello, J. M.; Aguilar, A.; Lewis, B. R.; Gibson, S. T.

    2014-04-01

    We have analyzed high-resolution (FWHM = 0.2 Å) extreme-ultraviolet (EUV, 800-1350 Å) laboratory emission spectra of molecular nitrogen excited by an electron impact at 20 and 100 eV under (mostly) optically thin, single-scattering experimental conditions. A total of 491 emission features were observed from N2 electronic-vibrational transitions and atomic N I and N II multiplets and their emission cross sections were measured. Molecular emission was observed at vibrationally excited ground-state levels as high as v'' = 17, from the a 1Π g , b 1Π u , and b'1Σ u + excited valence states and the Rydberg series c'n +1 1Σ u +, cn 1Π u , and on 1Π u for n between 3 and 9. The frequently blended molecular emission bands were disentangled with the aid of a sophisticated and predictive quantum-mechanical model of excited states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. Improved model parameters describing electronic transition moments were obtained from the experiment and allowed for a reliable prediction of the vibrationally summed electronic emission cross section, including an extrapolation to unobserved emission bands and those that are optically thick in the experimental spectra. Vibrationally dependent electronic excitation functions were inferred from a comparison of emission features following 20 and 100 eV electron-impact collisional excitation. The electron-impact-induced fluorescence measurements are compared with Cassini Ultraviolet Imaging Spectrograph observations of emissions from Titan's upper atmosphere.

  16. THE HIGH-RESOLUTION EXTREME-ULTRAVIOLET SPECTRUM OF N{sub 2} BY ELECTRON IMPACT

    SciTech Connect

    Heays, A. N.; Ajello, J. M.; Aguilar, A.; Lewis, B. R.; Gibson, S. T.

    2014-04-01

    We have analyzed high-resolution (FWHM = 0.2 Å) extreme-ultraviolet (EUV, 800-1350 Å) laboratory emission spectra of molecular nitrogen excited by an electron impact at 20 and 100 eV under (mostly) optically thin, single-scattering experimental conditions. A total of 491 emission features were observed from N{sub 2} electronic-vibrational transitions and atomic N I and N II multiplets and their emission cross sections were measured. Molecular emission was observed at vibrationally excited ground-state levels as high as v'' = 17, from the a {sup 1}Π {sub g} , b {sup 1}Π {sub u} , and b'{sup 1}Σ {sub u} {sup +} excited valence states and the Rydberg series c'{sub n} {sub +1} {sup 1}Σ {sub u} {sup +}, c{sub n} {sup 1}Π {sub u} , and o{sub n} {sup 1}Π {sub u} for n between 3 and 9. The frequently blended molecular emission bands were disentangled with the aid of a sophisticated and predictive quantum-mechanical model of excited states that includes the strong coupling between valence and Rydberg electronic states and the effects of predissociation. Improved model parameters describing electronic transition moments were obtained from the experiment and allowed for a reliable prediction of the vibrationally summed electronic emission cross section, including an extrapolation to unobserved emission bands and those that are optically thick in the experimental spectra. Vibrationally dependent electronic excitation functions were inferred from a comparison of emission features following 20 and 100 eV electron-impact collisional excitation. The electron-impact-induced fluorescence measurements are compared with Cassini Ultraviolet Imaging Spectrograph observations of emissions from Titan's upper atmosphere.

  17. AlGaN-on-Si backside illuminated photodetectors for the extreme ultraviolet (EUV) range

    NASA Astrophysics Data System (ADS)

    Malinowski, P. E.; Duboz, J.-Y.; John, J.; Sturdevant, C.; Das, J.; Derluyn, J.; Germain, M.; de Moor, P.; Minoglou, K.; Semond, F.; Frayssinet, E.; Hochedez, J.-F.; Giordanengo, B.; van Hoof, C.; Mertens, R.

    2010-04-01

    We report on the fabrication and characterization of solar blind Metal-Semiconductor-Metal (MSM) based photodetectors for use in the extreme ultraviolet (EUV) wavelength range. The devices were fabricated in the AlGaN-on- Si material system, with Aluminum Gallium Nitride (AlGaN) epitaxial layers grown on Si(111) by means of Molecular Beam Epitaxy. The detectors' IV characteristics and photoresponse were measured between 200 and 400 nm. Spectral responsivity was calculated for comparison with the state-of-the-art ultraviolet photodetectors. It reaches the order of 0.1 A/W at the cut-off wavelength of 360 nm, for devices with Au fingers of 3 μm width and spacing of 3 μm. The rejection ratio of visible radiation (400 nm) was more than 3 orders of magnitude. In the additional post-processing step, the Si substrate was removed locally under the active area of the MSM photodetectors using SF6-based Reactive Ion Etching (RIE). In such scheme, the backside illumination is allowed and there is no shadowing of the active layer by the metal electrodes, which is advantageous for the EUV sensitivity. Completed devices were assembled and wire-bonded in customized TO-8 packages with an opening. The sensitivity at EUV was verified at the wavelengths of 30.4 and 58.4 nm using a He-based beamline. AlGaN photodetectors are a promising alternative for highly demanding applications such as space science or modern EUV lithography. The backside illumination approach is suited in particular for large, 2D focal plane arrays.

  18. A giant planet undergoing extreme-ultraviolet irradiation by its hot massive-star host.

    PubMed

    Gaudi, B Scott; Stassun, Keivan G; Collins, Karen A; Beatty, Thomas G; Zhou, George; Latham, David W; Bieryla, Allyson; Eastman, Jason D; Siverd, Robert J; Crepp, Justin R; Gonzales, Erica J; Stevens, Daniel J; Buchhave, Lars A; Pepper, Joshua; Johnson, Marshall C; Colon, Knicole D; Jensen, Eric L N; Rodriguez, Joseph E; Bozza, Valerio; Novati, Sebastiano Calchi; D'Ago, Giuseppe; Dumont, Mary T; Ellis, Tyler; Gaillard, Clement; Jang-Condell, Hannah; Kasper, David H; Fukui, Akihiko; Gregorio, Joao; Ito, Ayaka; Kielkopf, John F; Manner, Mark; Matt, Kyle; Narita, Norio; Oberst, Thomas E; Reed, Phillip A; Scarpetta, Gaetano; Stephens, Denice C; Yeigh, Rex R; Zambelli, Roberto; Fulton, B J; Howard, Andrew W; James, David J; Penny, Matthew; Bayliss, Daniel; Curtis, Ivan A; DePoy, D L; Esquerdo, Gilbert A; Gould, Andrew; Joner, Michael D; Kuhn, Rudolf B; Labadie-Bartz, Jonathan; Lund, Michael B; Marshall, Jennifer L; McLeod, Kim K; Pogge, Richard W; Relles, Howard; Stockdale, Christopher; Tan, T G; Trueblood, Mark; Trueblood, Patricia

    2017-06-22

    The amount of ultraviolet irradiation and ablation experienced by a planet depends strongly on the temperature of its host star. Of the thousands of extrasolar planets now known, only six have been found that transit hot, A-type stars (with temperatures of 7,300-10,000 kelvin), and no planets are known to transit the even hotter B-type stars. For example, WASP-33 is an A-type star with a temperature of about 7,430 kelvin, which hosts the hottest known transiting planet, WASP-33b (ref. 1); the planet is itself as hot as a red dwarf star of type M (ref. 2). WASP-33b displays a large heat differential between its dayside and nightside, and is highly inflated-traits that have been linked to high insolation. However, even at the temperature of its dayside, its atmosphere probably resembles the molecule-dominated atmospheres of other planets and, given the level of ultraviolet irradiation it experiences, its atmosphere is unlikely to be substantially ablated over the lifetime of its star. Here we report observations of the bright star HD 195689 (also known as KELT-9), which reveal a close-in (orbital period of about 1.48 days) transiting giant planet, KELT-9b. At approximately 10,170 kelvin, the host star is at the dividing line between stars of type A and B, and we measure the dayside temperature of KELT-9b to be about 4,600 kelvin. This is as hot as stars of stellar type K4 (ref. 5). The molecules in K stars are entirely dissociated, and so the primary sources of opacity in the dayside atmosphere of KELT-9b are probably atomic metals. Furthermore, KELT-9b receives 700 times more extreme-ultraviolet radiation (that is, with wavelengths shorter than 91.2 nanometres) than WASP-33b, leading to a predicted range of mass-loss rates that could leave the planet largely stripped of its envelope during the main-sequence lifetime of the host star.

  19. A giant planet undergoing extreme-ultraviolet irradiation by its hot massive-star host

    NASA Astrophysics Data System (ADS)

    Gaudi, B. Scott; Stassun, Keivan G.; Collins, Karen A.; Beatty, Thomas G.; Zhou, George; Latham, David W.; Bieryla, Allyson; Eastman, Jason D.; Siverd, Robert J.; Crepp, Justin R.; Gonzales, Erica J.; Stevens, Daniel J.; Buchhave, Lars A.; Pepper, Joshua; Johnson, Marshall C.; Colon, Knicole D.; Jensen, Eric L. N.; Rodriguez, Joseph E.; Bozza, Valerio; Novati, Sebastiano Calchi; D'Ago, Giuseppe; Dumont, Mary T.; Ellis, Tyler; Gaillard, Clement; Jang-Condell, Hannah; Kasper, David H.; Fukui, Akihiko; Gregorio, Joao; Ito, Ayaka; Kielkopf, John F.; Manner, Mark; Matt, Kyle; Narita, Norio; Oberst, Thomas E.; Reed, Phillip A.; Scarpetta, Gaetano; Stephens, Denice C.; Yeigh, Rex R.; Zambelli, Roberto; Fulton, B. J.; Howard, Andrew W.; James, David J.; Penny, Matthew; Bayliss, Daniel; Curtis, Ivan A.; Depoy, D. L.; Esquerdo, Gilbert A.; Gould, Andrew; Joner, Michael D.; Kuhn, Rudolf B.; Labadie-Bartz, Jonathan; Lund, Michael B.; Marshall, Jennifer L.; McLeod, Kim K.; Pogge, Richard W.; Relles, Howard; Stockdale, Christopher; Tan, T. G.; Trueblood, Mark; Trueblood, Patricia

    2017-06-01

    The amount of ultraviolet irradiation and ablation experienced by a planet depends strongly on the temperature of its host star. Of the thousands of extrasolar planets now known, only six have been found that transit hot, A-type stars (with temperatures of 7,300-10,000 kelvin), and no planets are known to transit the even hotter B-type stars. For example, WASP-33 is an A-type star with a temperature of about 7,430 kelvin, which hosts the hottest known transiting planet, WASP-33b (ref. 1); the planet is itself as hot as a red dwarf star of type M (ref. 2). WASP-33b displays a large heat differential between its dayside and nightside, and is highly inflated-traits that have been linked to high insolation. However, even at the temperature of its dayside, its atmosphere probably resembles the molecule-dominated atmospheres of other planets and, given the level of ultraviolet irradiation it experiences, its atmosphere is unlikely to be substantially ablated over the lifetime of its star. Here we report observations of the bright star HD 195689 (also known as KELT-9), which reveal a close-in (orbital period of about 1.48 days) transiting giant planet, KELT-9b. At approximately 10,170 kelvin, the host star is at the dividing line between stars of type A and B, and we measure the dayside temperature of KELT-9b to be about 4,600 kelvin. This is as hot as stars of stellar type K4 (ref. 5). The molecules in K stars are entirely dissociated, and so the primary sources of opacity in the dayside atmosphere of KELT-9b are probably atomic metals. Furthermore, KELT-9b receives 700 times more extreme-ultraviolet radiation (that is, with wavelengths shorter than 91.2 nanometres) than WASP-33b, leading to a predicted range of mass-loss rates that could leave the planet largely stripped of its envelope during the main-sequence lifetime of the host star.

  20. Applications of extreme ultraviolet compact lasers to nanopatterning and high resolution holographic imaging

    NASA Astrophysics Data System (ADS)

    Wachulak, Przemyslaw Wojciech

    This dissertation describes two applications of extreme ultraviolet light in nanotechnology. Using radiation with a wavelength in the extreme ultraviolet (EUV) range allows to reach scales much smaller than with a conventional visible illumination. The first part of this dissertation describes a series of experiments that allowed the patterning at nanometer scales with sub-100nm resolution. Two types of photoresists (positive tone - PMMA and negative tone - HSQ) were patterned over the areas up to a few mm2 with features as small as 45nm using the interferometric lithography approach, reaching resolution equivalent to the wavelength of the illumination - 46.9nm. For the nanopatterning experiments two types of interferometers were studied in detail: Lloyd's mirror configuration and an amplitude division interferometer. Both approaches are presented and their advantages and drawbacks are discussed. The second part of the dissertation focuses on holographic imaging with ultimate resolution approaching the wavelength of the illumination. Different experiments were performed using Gabor's in-line holographic configuration and its capabilities in the EUV region were discussed. Holographic imaging was performed with different objects: AFM probes, spherical markers and carbon nanotubes. The holograms were stored in a high resolution recording medium - photoresist, digitized with an atomic force microscope and numerically reconstructed using a code based on the Fresnel propagator algorithm achieving in the reconstructed images the ultimate wavelength resolution. The resolution for the carbon nano-tubes images was assessed by two independent measurements: the knife-edge test resulting 45.5nm and an algorithm based on the correlation between the reconstructed image and a set of templates with variable resolution obtained by successive Gaussian filtering. This analysis yielded a resolution ˜46nm. A similar algorithm that allowed for the simultaneous assessment of the

  1. Energy transport in short-pulse-laser-heated targets measured using extreme ultraviolet laser backlighting.

    PubMed

    Wilson, L A; Tallents, G J; Pasley, J; Whittaker, D S; Rose, S J; Guilbaud, O; Cassou, K; Kazamias, S; Daboussi, S; Pittman, M; Delmas, O; Demailly, J; Neveu, O; Ros, D

    2012-08-01

    The accurate characterization of thermal electron transport and the determination of heating by suprathermal electrons in laser driven solid targets are both issues of great importance to the current experiments being performed at the National Ignition Facility, which aims to achieve thermonuclear fusion ignition using lasers. Ionization, induced by electronic heat conduction, can cause the opacity of a material to drop significantly once bound-free photoionization is no longer energetically possible. We show that this drop in opacity enables measurements of the transmission of extreme ultraviolet (EUV) laser pulses at 13.9 nm to act as a signature of the heating of thin (50 nm) iron layers with a 50-nm thick parylene-N (CH) overlay irradiated by 35-fs pulses at irradiance 3×10(16) Wcm(-2). Comparing EUV transmission measurements at different times after irradiation to fluid code simulations shows that the target is instantaneously heated by hot electrons (with approximately 10% of the laser energy), followed by thermal conduction with a flux limiter of ≈0.05.

  2. Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors

    SciTech Connect

    Kjornrattanawanich, B; Bajt, S

    2004-05-20

    We observe a dramatic dependence of the extreme ultraviolet (EUV) reflectivity of Mo/Y multilayers on the oxygen content of yttrium. This is explained by a change in microstructure, increase in roughness of the Y layers and not by an increase in absorption due to oxygen in Y layers. We find best reflectivity of 38.4% is achieved with an oxygen content of 25%, which reduces to 32.6% and 29.6% for multilayers manufactured from oxygen free yttrium and 39%-oxygen yttrium, respectively. These results highlight the importance of experimentally determined optical constants as well as interface roughness in multilayer calculations. In addition, lifetime stability of Mo/Y multilayers with different capping layers was monitored for one year. The molybdenum- and palladium-capped samples exhibited low surface roughness and about 4% relative reflectivity loss in one year. The relative reflectivity loss on yttrium-capped sample (yttrium with 39% oxygen) was about 8%. However, the reflectivity loss in all three capping layers occurred within the first 100 days after the deposition and the reflectivity remained stable afterwards.

  3. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks

    NASA Astrophysics Data System (ADS)

    Qi, Zhengqing John; Rankin, Jed; Narita, Eisuke; Kagawa, Masayuki

    2016-04-01

    Several challenges hinder extreme ultraviolet lithography (EUVL) photomask fabrication and its readiness for high-volume manufacturing (HVM). The lack in availability of pristine defect-free blanks as well as the absence of a robust mask repair technique mandates defect mitigation through pattern shift for the production of defect-free photomasks. By using known defect locations on a blank, the mask design can be intentionally shifted to avoid patterning directly over a defect. The work presented here provides a comprehensive look at pattern shift implementation to intersect EUV HVM for the 7-nm technology node (N7). An empirical error budget to compensate for various measurement errors, based on the latest HVM inspection and write tool capabilities, is first established and then verified postpatterning. The validated error budget is applied to 20 representative EUV blanks and pattern shift is performed using fully functional N7 chip designs that were recently used to fabricate working silicon-germanium devices. Probability of defect-free masks are explored for various N7 photomask levels, including metal, contact, and gate cut layers. From these results, an assessment is made on the current viability of defect-free EUV masks and what is required to construct a complete defect-free EUV mask set.

  4. Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

    SciTech Connect

    WRONOSKY,JOHN B.; SMITH,TONY G.; CRAIG,MARCUS J.; STURGIS,BEVERLY R.; DARNOLD,JOEL R.; WERLING,DAVID K.; KINCY,MARK A.; TICHENOR,DANIEL A.; WILLIAMS,MARK E.; BISCHOFF,PAUL

    2000-01-27

    This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

  5. Imaging extreme ultraviolet spectrometer employing a single toroidal diffraction grating: the initial evaluation.

    PubMed

    Huber, M C; Timothy, J G; Morgan, J S; Lemaitre, G; Tondello, G; Jannitti, E; Scarin, P

    1988-08-15

    A high-efficiency extreme ultraviolet (EUV) imaging spectrometer has been constructed and tested. The spectrometer employs a concave toroidal grating illuminated at normal incidence in a Rowland circle mounting and has only one reflecting surface. The toroidal grating has been fabricated by a new technique employing an elastically deformable submaster grating which is replicated in a spherical form and then mechanically distorted to produce the desired aspect ratio of the toroidal surface for stigmatic imaging over the selected wavelength range. The fixed toroidal grating used in the spectrometer is then replicated from this surface. Photographic tests and initial photoelectric tests with a 2-D pulse-counting detector system have verified the image quality of the toroidal grating at wavelengths near 600 A. The results of these initial tests are described in detail, and the basic designs of two instruments which could employ the imaging spectrometer for astrophysical investigations in space are briefly described, namely, a high-resolution EUV spectroheliometer for studies of the solar chromosphere, transition region, and corona and an EUV spectroscopic telescope for studies of nonsolar objects.

  6. Microdischarge extreme ultraviolet source with alkali metal vapor for surface morphology application

    SciTech Connect

    Higashiguchi, Takeshi; Yugami, Noboru; Terauchi, Hiromitsu; Otsuka, Takamitsu; Yamaguchi, Mami; Kikuchi, Keisuke; Yatagai, Toyohiko; Sasaki, Wataru; D'Arcy, Rebekah; Dunne, Padraig; O'Sullivan, Gerry

    2011-01-01

    We have characterized a discharge-produced potassium plasma extreme ultraviolet (XUV) source. Potassium ions produced strong broadband emission around 40 nm with a bandwidth of 8 nm (full width at half-maximum). By comparison with atomic structure calculations, the broadband emission is found to be primarily due to 3d-3p transitions in potassium ions ranging from K{sup 2+} to K{sup 4+}. The current-voltage characteristics of the microdischarge suggest that the source operates in a hollow cathode mode and consequently the emitting ions may be localized on the potassium electrode surface at the hole into the capillary. To understand the spectral behavior from the potassium plasmas we compared the spectra from the discharge-produced plasma with that from a laser-produced plasma. The spectra from the different (electric and laser) plasmas at the same electron temperature (12 eV) were almost the same. This compact capillary XUV source with a photon energy of 30 eV is a useful XUV emission source for surface morphology applications.

  7. Experiences with thin film filter development for the Extreme Ultraviolet Explorer

    NASA Technical Reports Server (NTRS)

    Vallerga, J. V.; Vedder, P. W.; Siegmund, O. H. W.

    1993-01-01

    The design, development, and optimization of the thin film filters used on the Extreme Ultraviolet Explorer (EUVE) Satellite to define the EUV wavelength bandpasses of the individual instruments was a complicated task. The bandpasses had to be optimized for the astrophysical goals of the EUVE mission and constrained by the strong geocoronal EUV background emission. Materials with optical constants that met these requirements had to be found and tested. In many cases these materials were not compatible or were not strong enough to survive the intense vibrations of a rocket launch. Other effects, such as photoelectron 'halo' produced in the filters, were not discovered until flight qualification. The final set of flight filters included: lexan/boron, aluminum/carbon, titanium/antimony/aluminum, and tin/silicon monoxide. This paper discusses the lessons learned in the development of these filters, including the optimization process, material interactions and problems, calibration techniques, vibration susceptibility, thermal tests, and photoelectron emission. We feel the experiences gained over the last 10 years creating the filter sets for EUVE will be invaluable for future missions that use thin film filters.

  8. Extreme Ultraviolet Explorer deep survey observations of a large flare on AU Microscopii

    NASA Technical Reports Server (NTRS)

    Cully, Scott L.; Siegmund, Oswald H. W.; Vedder, Peter W.; Vallerga, John V.

    1993-01-01

    We have made the first extended observation of a stellar flare in the EUV with 100 s time resolution. The flare was detected on AU Mic by the Extreme Ultraviolet Explorer satellite at 12:38 UT on 1992 July 15 during a 4 d observation from 1992 July 14 to 18. This was a large flare detected in the Lexan/boron (65-190 A) band with an observed peak count rate of 7.0 +/- 0.5 counts/s, corresponding to a peak luminosity of 10 exp 30 erg/s in the Lexan/boron bandpass. This is significantly above the measured quiescent level of 0.4 +/- 0.2 counts/s. The flare consisted of a sharp peak lasting about 2 hr, followed by a decaying tail that lasted more than a day. The total EUV energy of the event is estimated to be 3 x 10 exp 34 ergs. A second, smaller flare was also observed and is described. We conclude that the large emission measures on order of 6 x 10 exp 53/cu cm are due to large volumes with characteristic length scales of order the stellar radius. We compare these EUV observations with stellar flare observations in other bandpasses and estimate the likelihood of seeing similar flares in future observations.

  9. Extreme Ultraviolet Explorer observations of the magnetic cataclysmic variable RE 1938-461

    NASA Technical Reports Server (NTRS)

    Warren, John K.; Vallerga, John V.; Mauche, Christopher W.; Mukai, Koji; Siegmund, Oswald H. W.

    1993-01-01

    The magnetic cataclysmic variable RE 1938-461 was observed by the Extreme Ultraviolet Explorer (EUVE) Deep Survey instrument on 1992 July 8-9 during in-orbit calibration. It was detected in the Lexan/ boron (65-190 A) band, with a quiescent count rate of 0.0062 +/- 0.0017/s, and was not detected in the aluminum/carbon (160-360 A) band. The Lexan/boron count rate is lower than the corresponding ROSAT wide-field camera Lexan/boron count rate. This is consistent with the fact that the source was in a low state during an optical observation performed just after the EUVE observation, whereas it was in an optical high state during the ROSAT observation. The quiescent count rates are consistent with a virtual cessation of accretion. Two transient events lasting about 1 hr occurred during the Lexan/boron pointing, the second at a count rate of 0.050 +/- 0.006/s. This appears to be the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. We propose two possible explanations for the transient events.

  10. Extreme ultraviolet spectroscopy and modeling of Cu on the SSPX Spheromak and laser plasma 'Sparky'

    SciTech Connect

    Weller, M. E.; Safronova, A. S.; Kantsyrev, V. L.; Safronova, U. I.; Petkov, E. E.; Wilcox, P. G.; Osborne, G. C.; Clementson, J.; Beiersdorfer, P.

    2012-10-15

    Impurities play a critical role in magnetic fusion research. In large quantities, impurities can cool and dilute plasma creating problems for achieving ignition and burn; however in smaller amounts the impurities could provide valuable information about several plasma parameters through the use of spectroscopy. Many impurity ions radiate within the extreme ultraviolet (EUV) range. Here, we report on spectra from the silver flat field spectrometer, which was implemented at the Sustained Spheromak Physics experiment (SSPX) to monitor ion impurity emissions. The chamber within the SSPX was made of Cu, which makes M-shell Cu a prominent impurity signature. The Spect3D spectral analysis code was utilized to identify spectral features in the range of 115-315 A and to more fully understand the plasma conditions. A second set of experiments was carried out on the compact laser-plasma x-ray/EUV facility 'Sparky' at UNR, with Cu flat targets used. The EUV spectra were recorded between 40-300 A and compared with results from SSPX.

  11. CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

    NASA Astrophysics Data System (ADS)

    Nowak, K. M.; Ohta, T.; Suganuma, T.; Fujimoto, J.; Mizoguchi, H.; Sumitani, A.; Endo, A.

    2013-12-01

    It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.

  12. On the Importance of the Flare's Late Phase for the Solar Extreme Ultraviolet Irradiance

    NASA Technical Reports Server (NTRS)

    Woods, Thomas N.; Eparvier, Frank; Jones, Andrew R.; Hock, Rachel; Chamberlin, Phillip C.; Klimchuk, James A.; Didkovsky, Leonid; Judge, Darrell; Mariska, John; Bailey, Scott; hide

    2011-01-01

    The new solar extreme ultraviolet (EUV) irradiance observations from NASA Solar Dynamics Observatory (SDO) have revealed a new class of solar flares that are referred to as late phase flares. These flares are characterized by the hot 2-5 MK coronal emissions (e.g., Fe XVI 33.5 nm) showing large secondary peaks that appear many minutes to hours after an eruptive flare event. In contrast, the cool 0.7-1.5 MK coronal emissions (e.g., Fe IX 17.1 nm) usually dim immediately after the flare onset and do not recover until after the delayed second peak of the hot coronal emissions. We refer to this period of 1-5 hours after the fl amrea sin phase as the late phase, and this late phase is uniquely different than long duration flares associated with 2-ribbon flares or large filament eruptions. Our analysis of the late phase flare events indicates that the late phase involves hot coronal loops near the flaring region, not directly related to the original flaring loop system but rather with the higher post-eruption fields. Another finding is that space weather applications concerning Earth s ionosphere and thermosphere need to consider these late phase flares because they can enhance the total EUV irradiance flare variation by a factor of 2 when the late phase contribution is included.

  13. Electron impact excitation collision strengths for extreme ultraviolet lines of Fe VII

    SciTech Connect

    Tayal, S. S.; Zatsarinny, O. E-mail: oleg.zatsarinny@drake.edu

    2014-06-10

    Extensive calculations have been performed for electron impact excitation collision strengths and oscillator strengths for the Fe VII extreme ultraviolet lines of astrophysical importance. The collision strengths for fine-structure transitions are calculated in the B-spline Breit-Pauli R-matrix approach. The target wavefunctions have been calculated in the multiconfiguration Hartree-Fock method with term-dependent non-orthogonal orbitals. The close-coupling expansion includes 189 fine-structure levels of Fe VII belonging to terms of the ground 3p {sup 6}3d {sup 2} and excited 3p {sup 5}3d {sup 3}, 3p {sup 6}3d4l, 3p {sup 6}3d5s, and 3p {sup 6}3d5p configurations. The effective collision strengths are determined from the electron excitation collision strengths by integration over a Maxwellian distribution of electron velocities. The effective collision strengths are provided for 17766 fine-structure transitions at electron temperatures from 10{sup 4} to 10{sup 7} K. Our results normally agree with the previous R-matrix frame-transformation calculations by Witthoeft and Badnell. However, there are important differences for some transitions with the previous calculations. The corrections to the previous results are mainly due to more extensive expansions for the Fe VII target states.

  14. Extreme ultraviolet spectroscopy of low-Z ion plasmas for fusion applications

    SciTech Connect

    Wilcox, P. G.; Safronova, A. S.; Kantsyrev, V. L.; Safronova, U. I.; Williamson, K. M.; Yilmaz, M. F.; Clementson, J.; Beiersdorfer, P.; Struve, K. W.

    2008-10-15

    The study of impurities is a key component of magnetic fusion research as it is directly related to plasma properties and steady-state operation. Two of the most important low-Z impurities are carbon and oxygen. The appropriate method of diagnosing these ions in plasmas is extreme ultraviolet (EUV) spectroscopy. In this work the results of two different sets of experiments are considered, and the spectra in a spectral region from 40 to 300 A are analyzed. The first set of experiments was carried out at the Sustained Spheromak Physics Experiment at LLNL, where EUV spectra of oxygen ions were recorded. The second set of experiments was performed at the compact laser-plasma x-ray/EUV facility 'Sparky' at UNR. In particular, Mylar and Teflon slabs were used as targets to produce carbon, oxygen, and fluorine ions of different ionization stages. Nonlocal thermodynamic equilibrium kinetic models of O, F, and C were applied to identify the most diagnostically important spectral features of low-Z ions between 40 to 300 A and to provide plasma parameters for both sets of experiments.

  15. Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

    NASA Astrophysics Data System (ADS)

    Del Re, Ryan; Passarelli, James; Sortland, Miriam; Cardineau, Brian; Ekinci, Yasin; Buitrago, Elizabeth; Neisser, Mark; Freedman, Daniel A.; Brainard, Robert L.

    2015-10-01

    Pure thin films of organotin compounds have been lithographically evaluated using extreme ultraviolet lithography (EUVL, 13.5 nm). Twenty compounds of the type R2Sn) were spin-coated from solutions in toluene, exposed to EUV light, and developed in organic solvents. Exposures produced negative-tone contrast curves and dense-line patterns using interference lithography. Contrast-curve studies indicated that the photosensitivity is linearly related to the molecular weight of the carboxylate group bound to tin. Additionally, photosensitivity was found to be linearly related to free radical stability of the hydrocarbon group bound directly to tin (R=phenyl, butyl, and benzyl). Dense-line patterning capabilities varied, but two resists in particular show exceptionally good line edge roughness (LER). A resist composed of an amorphous film of )SnCC)2 (1) achieved 1.4 nm LER at 22-nm half-pitch patterning and a resist composed of )Sn) (2) achieved 1.1 nm LER at 35-nm half-pitch at high exposure doses (600 mJ/cm2). Two photoresists that use olefin-based carboxylates, )SnCCH (3) and )SnCC (4), demonstrated better photospeeds (5 mJ/cm2 and 27 mJ/cm2) but worse LER.

  16. Mode Conversion of a Solar Extreme-ultraviolet Wave over a Coronal Cavity

    NASA Astrophysics Data System (ADS)

    Zong, Weiguo; Dai, Yu

    2017-01-01

    We report on observations of an extreme-ultraviolet (EUV) wave event in the Sun on 2011 January 13 by Solar Terrestrial Relations Observatory and Solar Dynamics Observatory in quadrature. Both the trailing edge and the leading edge of the EUV wave front in the north direction are reliably traced, revealing generally compatible propagation velocities in both perspectives and a velocity ratio of about 1/3. When the wave front encounters a coronal cavity near the northern polar coronal hole, the trailing edge of the front stops while its leading edge just shows a small gap and extends over the cavity, meanwhile getting significantly decelerated but intensified. We propose that the trailing edge and the leading edge of the northward propagating wave front correspond to a non-wave coronal mass ejection component and a fast-mode magnetohydrodynamic wave component, respectively. The interaction of the fast-mode wave and the coronal cavity may involve a mode conversion process, through which part of the fast-mode wave is converted to a slow-mode wave that is trapped along the magnetic field lines. This scenario can reasonably account for the unusual behavior of the wave front over the coronal cavity.

  17. Comparative study of line roughness metrics of chemically amplified and inorganic resists for extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Fallica, Roberto; Buitrago, Elizabeth; Ekinci, Yasin

    2016-07-01

    We present a comprehensive comparative study of the roughness metrics of different resists. Dense line/space of polymethyl methacrylate, hydrogen silsesquioxane, a metal oxide-based resist, and different chemically amplified resists (CARs) have been patterned by extreme ultraviolet interference lithography. All three line width roughness (LWR) metrics: the root-mean-square (r.m.s.) roughness value σLWR, the correlation length ξ, and the roughness exponent α, were extracted by metrological analysis of top-down SEM images. We found that all metrics are required to fully describe the overall roughness of each resist. Our measurements indicate that in fact, a few of the state-of-the-art resists tested here can meet the International Technology Roadmap for Semiconductors requirements for σLWR. The correlation length ξ was also found to be considerably higher in polymer-based materials in comparison to nonpolymers. Finally, the roughness exponent α, interpreted using the concept of fractal geometry, was found to be mainly affected by acid diffusion in CARs, where it produces line edges with a higher complexity than in non-CAR resists. These results indicate that the different resists platforms show very different LWR metrics and roughness is not manifested only in the σLWR but in all parameters. Therefore, all roughness metrics should be taken into account when comparing the performance among different resists since they ultimately have a substantial impact on device performance.

  18. Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

    NASA Astrophysics Data System (ADS)

    Matsunari, S.; Kakutani, Y.; Aoki, T.; Kawata, S.; Murakami, K.

    2009-03-01

    Si/Mo multi-layer mirrors are oxidized by a photochemical reaction with water gas and extreme ultraviolet (EUV) light. They do not have enough durability in EUV lithography tools. 14 types of capped mirror samples (SiO2, TiO2, V2O5, Cr2O3, Mn2O3, Y2O3, Nb2O5, RuO2, Rh2O3, PdO, SnO2, La2O3, CeO2, WO3-capped) have been investigated on the anti-oxidation property under the 150-1600J/mm2 EUV irradiation at SR facilities. We have irradiated samples under the 1x10-4Pa and 9x10-4Pa water vapors. TiO2, V2O5, Cr2O3, Nb2O5, CeO2-capped mirror samples suppress reflectance drops and Si layers oxidation. These metal ions have similar radii. We have measured local structure of the RuO2 layer with lower durability. The RuO2 layer is amorphous. This Amorphous RuO2 layer loses the long range order of bonds and the short range order of the first shell. The Ru-O bonds remains with losing coordination number. To accelerate durability tests for a high volume machine, we have constructed a new dedicated beam line at the SAGA Light Source.

  19. Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

    NASA Astrophysics Data System (ADS)

    Shahzad, M.; Culfa, O.; Rossall, A. K.; Wilson, L. A.; Guilbaud, O.; Kazamias, S.; Delmas, O.; Demailly, J.; Maitrallain, A.; Pittman, M.; Baynard, E.; Farjardo, M.; Tallents, G. J.

    2015-02-01

    We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 1016 Wcm-2 is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe5+ and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

  20. A Model of Electronically-Excited States of N_2 and its Extreme-Ultraviolet Spectrum.

    NASA Astrophysics Data System (ADS)

    Heays, A. N.; Lewis, B. R.; Gibson, S. T.

    2013-06-01

    The nitrogen molecule is a long-studied and difficult problem in molecular spectroscopy, and many important details of its interaction with radiation remain unexplained. A principal problem of continuing interest concerns the resonant photoabsorption and resultant predissociation of N_2 when exposed to extreme-ultraviolet radiation. A model of the relevant excited states of N_2 has been developed in order to quantify their interactions and reproduce photoabsorption and photodissociation cross sections between 100 000 and 118 500 cm^{-1} (100 and 84 nm). This solves the radial Schrödinger equation within a coupled-channels formulation for new diabatic potential-energy curves, homogeneous and heterogeneous state mixing, and electronic transition moments for the optically allowed transitions. The accidental predissociation of {}^1Π_u states between 100 000 and 112 500 cm^{-1} has been quantitatively modelled by spin-orbit coupling these to a set of {}^3Π_u and {}^3Σ_u^+ states which includes unbound members. Following reference to a large experimental database, the model is both accurate and comprehensive and may be used to simulate synthetic cross sections for any temperature or isotopologue. These are suitable for use in high-resolution photochemical models of atmospheric and astrophysical environments.

  1. Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

    SciTech Connect

    Roy, Amitava E-mail: aroy@barc.gov.in; Murtaza Hassan, Syed; Harilal, Sivanandan S.; Hassanein, Ahmed; Endo, Akira; Mocek, Tomas

    2014-05-15

    We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasma show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.

  2. The Extreme Ultraviolet Imagers (EUVIs): Earth-observing telescopes on International Space Station

    NASA Astrophysics Data System (ADS)

    Uji, Kentaro; Yoshikawa, Ichiro; Yoshioka, Kazuo; Murakami, Go; Yamazaki, Atsushi

    2012-11-01

    The Extreme Ultraviolet Imagers (EUVIs) were launched on 21st July 2012 as payloads to the Exposed Facility of the Japanese Experiment Module (JEM-EF) on the International Space Station. The EUVIs are parts of the IMAP (Ionosphere, Mesosphere, upper Atmosphere, and Plasmasphere mapping) mission to observe the Earth's upper atmosphere, mesosphere, ionosphere, thermosphere and plasmasphere. The other part of IMAP is a visible and near-infrared spectral imager (VISI). In this mission, we install two independent and identical telescopes. One telescope detects the terrestrial EUV emission from O+ (at the wavelength of 83.4 nm), and the other one detects He+ (30.4 nm). At the altitude of approximately 400 km, the two telescopes direct towards the Earth's limb to look at the ionosphere and plasmasphere from the inside-out. The maximum spatial resolution is 0.1° and time resolution is 1 minute. The optical instruments consist of multilayer coated mirrors which are optimized for 30.4 nm, metallic thin filters and 5-stage microchannel plates to pick up photon events efficiently. In our presentation, we report the mission overview, the instruments and the result of ground calibrations.

  3. A study of the mechanical vibrations of a table-top extreme ultraviolet interference nanolithography tool.

    PubMed

    Prezioso, S; De Marco, P; Zuppella, P; Santucci, S; Ottaviano, L

    2010-04-01

    A prototype low cost table-top extreme ultraviolet (EUV) laser source (1.5 ns pulse duration, lambda=46.9 nm) was successfully employed as a laboratory scale interference nanolithography (INL) tool. Interference patterns were obtained with a simple Lloyd's mirror setup. Periodic structures on Polymethylmethacrylate/Si substrates were produced on large areas (8 mm(2)) with resolutions from 400 to 22.5 nm half pitch (the smallest resolution achieved so far with table-top EUV laser sources). The mechanical vibrations affecting both the laser source and Lloyd's setup were studied to determine if and how they affect the lateral resolution of the lithographic system. The vibration dynamics was described by a statistical model based on the assumption that the instantaneous position of the vibrating mechanical parts follows a normal distribution. An algorithm was developed to simulate the process of sample irradiation under different vibrations. The comparison between simulations and experiments allowed to estimate the characteristic amplitude of vibrations that was deduced to be lower than 50 nm. The same algorithm was used to reproduce the expected pattern profiles in the lambda/4 half pitch physical resolution limit. In that limit, a nonzero pattern modulation amplitude was obtained from the simulations, comparable to the peak-to-valley height (2-3 nm) measured for the 45 nm spaced fringes, indicating that the mechanical vibrations affecting the INL tool do not represent a limit in scaling down the resolution.

  4. Study of Solar Energetic Particle Associations with Coronal Extreme-ultraviolet Waves

    NASA Astrophysics Data System (ADS)

    Park, Jinhye; Innes, D. E.; Bucik, R.; Moon, Y.-J.; Kahler, S. W.

    2015-07-01

    We study the relationship between large gradual solar energetic particle (SEP) events and associated extreme-ultraviolet (EUV) wave properties in 16 events that occurred between 2010 August and 2013 May and were observed by SDO, the Solar and Heliospheric Observatory (SOHO), and/or STEREO. We determine onset times, peak times, and peak fluxes of the SEP events in the SOHO/ERNE and STEREO/LET proton channels (6-10 MeV). The EUV wave arrival times and their speeds from the source sites to the spacecraft footpoints in the photosphere, which are magnetically connected to the spacecraft by Parker spiral and potential fields, are determined by spacetime plots from the full-Sun heliographic images created by combining STEREO-A and STEREO-B 195 Å and SDO 193 Å images. The SEP peak fluxes increase with the EUV wave speeds, and the SEP spectral indices become harder with the speeds. This shows that higher energetic particle fluxes are associated with faster EUV waves, which are considered as the lateral expansions of coronal-mass-ejection-driven shocks in the low corona.

  5. Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

    SciTech Connect

    Shahzad, M.; Culfa, O.; Rossall, A. K.; Tallents, G. J.; Wilson, L. A.; Guilbaud, O.; Kazamias, S.; Delmas, O.; Demailly, J.; Maitrallain, A.; Pittman, M.; Baynard, E.; Farjardo, M.

    2015-02-15

    We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV). A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.

  6. Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

    NASA Astrophysics Data System (ADS)

    Kim, Eun-Jin; You, Jee-Hye; Kim, Seong-Sue; Cho, Han-Ku; An, Ilsin; Oh, Hye-Keun

    2009-03-01

    Extreme ultraviolet lithography (EUVL) is believed to be possible patterning technology which can make 22 nm and below. EUV uses a reflective mask so that the mask is shined with the oblique incident light. Thus, the study of incident angle effect is very important. Currently, 6 degree oblique incidence is main stream, but 5 degree incident angle is also studied for 0.25 NA. Incident angles larger than 6 degree are also considered for larger NA. This incident angle will affect many things, eventually to the line width. Shadow effect also strongly depends on the incident angle. This shadow effect in the EUVL mask is an important factor that decreases the contrast of the aerial image and causes a directional problem, thus it will make line width variation. The off-axis illumination (OAI) will be used with conventional on-axis illumination to make much smaller patterns. This OAI will split the main beam and change the incident angle. We found that if the incident angle increased with higher degree of coherence, the aerial image went worse. The CD difference between the horizontal and the vertical pattern is also dependent on the degree of coherence even though it is small.

  7. Extreme ultraviolet diagnostic upgrades for kink mode control on the HBT-EP tokamak

    NASA Astrophysics Data System (ADS)

    Levesque, J. P.; Brooks, J. W.; Desanto, S.; Mauel, M. E.; Navratil, G. A.; Page, J. W.; Hansen, C. J.; Delgado-Aparicio, L.

    2016-10-01

    Optical diagnostics can provide non-invasive measurements of tokamak equilibria and the internal characteristics of MHD mode activity. We present research plans and ongoing progress on upgrading extreme ultraviolet (EUV) diagnostics in the HBT-EP tokamak. Four sets of 16 poloidal views will allow tomographic reconstruction of plasma emissivity and internal kink mode structure. Emission characteristics of naturally-occurring m/n = 2/1, 3/2, and 3/1 tearing and kink modes will be compared with expectations from a synthetic diagnostic. Coupling between internal and external modes leading up to disruptions is studied. The internal plasma response to external magnetic perturbations is investigated, and compared with magnetic response measurements. Correlation between internal emissivity and external magnetic measurements provides a global picture of long-wavelength MHD instabilities. Measurements are input to HBT-EP's GPU-based feedback system, allowing active feedback for kink modes using only optical sensors and both magnetic and edge current actuators. A separate two-color, 16-chord tangential system will be installed next year to allow reconstruction of temperature profiles and their fluctuations versus time. Supported by U.S. DOE Grant DE-FG02-86ER53222.

  8. Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

    SciTech Connect

    Kubiak, G.D.; Tichenor, D.A.; Ray-Chaudhuri, A.K.

    1994-08-01

    The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 {mu}m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 {mu}m.

  9. Control of coherent excitation of neon in the extreme ultraviolet regime.

    PubMed

    Plenge, Jürgen; Wirsing, Andreas; Raschpichler, Christopher; Wassermann, Bernhard; Rühl, Eckart

    2011-01-01

    Coherent excitation of a superposition of Rydberg states in neon by the 13th harmonic of an intense 804 nm pulse and the formation of a wave packet is reported. Pump-probe experiments are performed, where the 3d-manifold of the 2p6-->2p5 (2P3/2) 3d [1/2]1- and 2p6-->2p5 (2P3/2) 3d [3/2]1-transitions are excited by an extreme ultraviolet (XUV) radiation pulse, which is centered at 20.05 eV photon energy. The temporal evolution of the excited state population is probed by ionization with a time-delayed 804 nm pulse. Control of coherent transient excitation and wave packet dynamics in the XUV-regime is demonstrated, where the spectral phase of the 13th harmonic is used as a control parameter. Modulation of the phase is achieved by propagation of the XUV-pulse through neon of variable gas density. The experimental results indicate that phase-shaped high-order harmonics can be used to control fundamental coherent excitation processes in the XUV-regime.

  10. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    SciTech Connect

    Malinowski, Pawel E.; Mertens, Robert; Van Hoof, Chris; Duboz, Jean-Yves; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Giordanengo, Boris; BenMoussa, Ali

    2011-04-04

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  11. STUDY OF SOLAR ENERGETIC PARTICLE ASSOCIATIONS WITH CORONAL EXTREME-ULTRAVIOLET WAVES

    SciTech Connect

    Park, Jinhye; Moon, Y.-J.; Innes, D. E.; Bucik, R.; Kahler, S. W.

    2015-07-20

    We study the relationship between large gradual solar energetic particle (SEP) events and associated extreme-ultraviolet (EUV) wave properties in 16 events that occurred between 2010 August and 2013 May and were observed by SDO, the Solar and Heliospheric Observatory (SOHO), and/or STEREO. We determine onset times, peak times, and peak fluxes of the SEP events in the SOHO/ERNE and STEREO/LET proton channels (6–10 MeV). The EUV wave arrival times and their speeds from the source sites to the spacecraft footpoints in the photosphere, which are magnetically connected to the spacecraft by Parker spiral and potential fields, are determined by spacetime plots from the full-Sun heliographic images created by combining STEREO-A and STEREO-B 195 Å and SDO 193 Å images. The SEP peak fluxes increase with the EUV wave speeds, and the SEP spectral indices become harder with the speeds. This shows that higher energetic particle fluxes are associated with faster EUV waves, which are considered as the lateral expansions of coronal-mass-ejection-driven shocks in the low corona.

  12. Compact advanced extreme-ultraviolet imaging spectrometer for spatiotemporally varying tungsten spectra from fusion plasmas

    NASA Astrophysics Data System (ADS)

    Song, Inwoo; Seon, C. R.; Hong, Joohwan; An, Y. H.; Barnsley, R.; Guirlet, R.; Choe, Wonho

    2017-09-01

    A compact advanced extreme-ultraviolet (EUV) spectrometer operating in the EUV wavelength range of a few nanometers to measure spatially resolved line emissions from tungsten (W) was developed for studying W transport in fusion plasmas. This system consists of two perpendicularly crossed slits—an entrance aperture and a space-resolved slit—inside a chamber operating as a pinhole, which enables the system to obtain a spatial distribution of line emissions. Moreover, a so-called v-shaped slit was devised to manage the aperture size for measuring the spatial resolution of the system caused by the finite width of the pinhole. A back-illuminated charge-coupled device was used as a detector with 2048 × 512 active pixels, each with dimensions of 13.5 × 13.5 μm2. After the alignment and installation on Korea superconducting tokamak advanced research, the preliminary results were obtained during the 2016 campaign. Several well-known carbon atomic lines in the 2-7 nm range originating from intrinsic carbon impurities were observed and used for wavelength calibration. Further, the time behavior of their spatial distributions is presented.

  13. Extreme ultraviolet detection using AlGaN-on-Si inverted Schottky photodiodes

    NASA Astrophysics Data System (ADS)

    Malinowski, Pawel E.; Duboz, Jean-Yves; De Moor, Piet; Minoglou, Kyriaki; John, Joachim; Horcajo, Sara Martin; Semond, Fabrice; Frayssinet, Eric; Verhoeve, Peter; Esposito, Marco; Giordanengo, Boris; BenMoussa, Ali; Mertens, Robert; Van Hoof, Chris

    2011-04-01

    We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky diodes for extreme ultraviolet (EUV) detection. AlGaN layers were grown on silicon wafers by molecular beam epitaxy with the conventional and inverted Schottky structure, where the undoped, active layer was grown before or after the n-doped layer, respectively. Different current mechanisms were observed in the two structures. The inverted Schottky diode was designed for the optimized backside sensitivity in the hybrid imagers. A cut-off wavelength of 280 nm was observed with three orders of magnitude intrinsic rejection ratio of the visible radiation. Furthermore, the inverted structure was characterized using a EUV source based on helium discharge and an open electrode design was used to improve the sensitivity. The characteristic He I and He II emission lines were observed at the wavelengths of 58.4 nm and 30.4 nm, respectively, proving the feasibility of using the inverted layer stack for EUV detection.

  14. Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

    NASA Astrophysics Data System (ADS)

    Fallica, Roberto; Stowers, Jason K.; Grenville, Andrew; Frommhold, Andreas; Robinson, Alex P. G.; Ekinci, Yasin

    2016-07-01

    The dynamic absorption coefficients of several chemically amplified resists (CAR) and non-CAR extreme ultraviolet (EUV) photoresists are measured experimentally using a specifically developed setup in transmission mode at the x-ray interference lithography beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general, the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called chemical sensitivity to account for all the postabsorption chemical reaction ongoing in the resist, which also predicts a quantitative clearing volume and clearing radius, due to the photon absorption in the resist. These parameters may help provide deeper insight into the underlying mechanisms of the EUV concepts of clearing volume and clearing radius, which are then defined and quantitatively calculated.

  15. THE EXTREME ULTRAVIOLET DEFICIT AND MAGNETICALLY ARRESTED ACCRETION IN RADIO-LOUD QUASARS

    SciTech Connect

    Punsly, Brian

    2014-12-20

    The Hubble Space Telescope composite quasar spectra presented in Telfer et al. show a significant deficit of emission in the extreme ultraviolet for the radio-loud component of the quasar population (RLQs) compared to the radio-quiet component of the quasar population. The composite quasar continuum emission between 1100 Å and ∼580 Å is generally considered to be associated with the innermost regions of the accretion flow onto the central black hole. The deficit between 1100 Å and 580 Å in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. It is proposed that this can be the result of islands of large-scale magnetic flux in RLQs that are located close to the central black hole that remove energy from the accretion flow as Poynting flux (sometimes called magnetically arrested accretion). These magnetic islands are natural sites for launching relativistic jets. Based on the Telfer et al. data and the numerical simulations of accretion flows in Penna et al., the magnetic islands are concentrated between the event horizon and an outer boundary of <2.8 M (in geometrized units) for rapidly rotating black holes and <5.5 M for modestly rotating black holes.

  16. DIET Processes on Ruthenium Surfaces Related to Extreme Ultraviolet Lithography (EUVL)

    SciTech Connect

    Yakshinskiy, B.; Wasielewski, R; Loginova, E; Hedhili, M; Madey, T

    2008-01-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions (high vacuum, and 13.5 nm (92 eV) photons). Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H{sub 2}O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is 6 x 10{sup -19} cm{sup 2}. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is 0.02 electrons/photon at 92 eV.

  17. Considerations for a free-electron laser-based extreme-ultraviolet lithography program

    NASA Astrophysics Data System (ADS)

    Hosler, Erik R.; Wood, Obert R.; Barletta, William A.; Mangat, Pawitter J. S.; Preil, Moshe E.

    2015-03-01

    Recent years have seen great strides in the development of extreme ultraviolet (EUV) laser-produced plasma sources. Field deployed EUV exposure tools are now capable of facilitating advanced technology node development. Nevertheless, as the required manufacturing exposure dose scales, EUV sources must follow suit and provide 500- 1000 W to maintain production throughputs. A free-electron laser (FEL) offers a cost effective, single-source alternative for powering an entire EUV lithography program. FEL integration into semiconductor fab architecture will require both unique facility considerations as well as a paradigm shift in lithography operations. Critical accelerator configurations relating to energy recovery, multi-turn acceleration, and operational mode are discussed from engineering/scientific, cost-minimization, and safety perspectives. Furthermore, the individual components of a FEL (electron injector, RF systems, undulator, etc.) are examined with respect to both design and cost, considering existing technology as well as prospective innovations. Finally, FEL development and deployment roadmaps are presented, focusing on manufacturer deployment for the 5 nm or 3 nm technology nodes.[1-3

  18. Extreme ultraviolet imaging of three-dimensional magnetic reconnection in a solar eruption

    PubMed Central

    Sun, J. Q.; Cheng, X.; Ding, M. D.; Guo, Y.; Priest, E. R.; Parnell, C. E.; Edwards, S. J.; Zhang, J.; Chen, P. F.; Fang, C.

    2015-01-01

    Magnetic reconnection, a change of magnetic field connectivity, is a fundamental physical process in which magnetic energy is released explosively, and it is responsible for various eruptive phenomena in the universe. However, this process is difficult to observe directly. Here, the magnetic topology associated with a solar reconnection event is studied in three dimensions using the combined perspectives of two spacecraft. The sequence of extreme ultraviolet images clearly shows that two groups of oppositely directed and non-coplanar magnetic loops gradually approach each other, forming a separator or quasi-separator and then reconnecting. The plasma near the reconnection site is subsequently heated from ∼1 to ≥5 MK. Shortly afterwards, warm flare loops (∼3 MK) appear underneath the hot plasma. Other observational signatures of reconnection, including plasma inflows and downflows, are unambiguously revealed and quantitatively measured. These observations provide direct evidence of magnetic reconnection in a three-dimensional configuration and reveal its origin. PMID:26113464

  19. Active Region Moss: Doppler Shifts from Hinode/Extreme-ultraviolet Imaging Spectrometer Observations

    NASA Astrophysics Data System (ADS)

    Tripathi, Durgesh; Mason, Helen E.; Klimchuk, James A.

    2012-07-01

    Studying the Doppler shifts and the temperature dependence of Doppler shifts in moss regions can help us understand the heating processes in the core of the active regions. In this paper, we have used an active region observation recorded by the Extreme-ultraviolet Imaging Spectrometer (EIS) on board Hinode on 2007 December 12 to measure the Doppler shifts in the moss regions. We have distinguished the moss regions from the rest of the active region by defining a low-density cutoff as derived by Tripathi et al. in 2010. We have carried out a very careful analysis of the EIS wavelength calibration based on the method described by Young et al. in 2012. For spectral lines having maximum sensitivity between log T = 5.85 and log T = 6.25 K, we find that the velocity distribution peaks at around 0 km s-1 with an estimated error of 4-5 km s-1. The width of the distribution decreases with temperature. The mean of the distribution shows a blueshift which increases with increasing temperature and the distribution also shows asymmetries toward blueshift. Comparing these results with observables predicted from different coronal heating models, we find that these results are consistent with both steady and impulsive heating scenarios. However, the fact that there are a significant number of pixels showing velocity amplitudes that exceed the uncertainty of 5 km s-1 is suggestive of impulsive heating. Clearly, further observational constraints are needed to distinguish between these two heating scenarios.

  20. Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

    SciTech Connect

    Spector, S. J.; White, D. L.; Tennant, D. M.; Ocola, L. E.; Novembre, A. E.; Peabody, M. L.; Wood, O. R. II

    1999-11-01

    We have developed two new methods for at-wavelength inspection of mask blanks for extreme-ultraviolet (EUV) lithography. In one method an EUV photoresist is applied directly to a mask blank which is then flood exposed with EUV light and partially developed. In the second method, the photoresist is applied to an EUV transparent membrane that is placed in close proximity to the mask and then exposed and developed. Both reflectivity defects and phase defects alter the exposure of the resist, resulting in mounds of resist at defect sites that can then be located by visual inspection. In the direct application method, a higher contrast resist was shown to increase the height of the mounds, thereby improving the sensitivity of the technique. In the membrane method, a holographic technique was used to reconstruct an image of the mask, revealing the presence of very small defects, approximately 0.2 {mu}m in size. The demonstrated clean transfer of phase and amplitude defects to resist features on a membrane will be important when flagging defects in an automatic inspection tool. (c) 1999 American Vacuum Society.