Oscillator metrology with software defined radio.

PubMed

Sherman, Jeff A; Jördens, Robert

2016-05-01

Analog electrical elements such as mixers, filters, transfer oscillators, isolating buffers, dividers, and even transmission lines contribute technical noise and unwanted environmental coupling in time and frequency measurements. Software defined radio (SDR) techniques replace many of these analog components with digital signal processing (DSP) on rapidly sampled signals. We demonstrate that, generically, commercially available multi-channel SDRs are capable of time and frequency metrology, outperforming purpose-built devices by as much as an order-of-magnitude. For example, for signals at 10 MHz and 6 GHz, we observe SDR time deviation noise floors of about 20 fs and 1 fs, respectively, in under 10 ms of averaging. Examining the other complex signal component, we find a relative amplitude measurement instability of 3 × 10(-7) at 5 MHz. We discuss the scalability of a SDR-based system for simultaneous measurement of many clocks. SDR's frequency agility allows for comparison of oscillators at widely different frequencies. We demonstrate a novel and extreme example with optical clock frequencies differing by many terahertz: using a femtosecond-laser frequency comb and SDR, we show femtosecond-level time comparisons of ultra-stable lasers with zero measurement dead-time.

Silicon-Chip-Based Optical Frequency Combs

DTIC Science & Technology

2015-10-26

waveform generation, frequency metrology, and astronomical spectrograph calibration [2,3,4]. Traditionally, modelocked solid-state and fiber lasers have...different external-cavity diode lasers covering a total tuning range between 1450 nm and 1640 nm. Lensed fibers are used to couple into and out of the...cavity resonance of a Si3N4 microring resonator with a single-frequency tunable diode laser amplified by a ytterbium-doped fiber amplifier. We use a

Computer aided design of Langasite resonant cantilevers: analytical models and simulations

NASA Astrophysics Data System (ADS)

Tellier, C. R.; Leblois, T. G.; Durand, S.

2010-05-01

Analytical models for the piezoelectric excitation and for the wet micromachining of resonant cantilevers are proposed. Firstly, computations of metrological performances of micro-resonators allow us to select special cuts and special alignment of the cantilevers. Secondly the self-elaborated simulator TENSOSIM based on the kinematic and tensorial model furnishes etching shapes of cantilevers. As the result the number of selected cuts is reduced. Finally the simulator COMSOL® is used to evaluate the influence of final etching shape on metrological performances and especially on the resonance frequency. Changes in frequency are evaluated and deviating behaviours of structures with less favourable built-ins are tested showing that the X cut is the best cut for LGS resonant cantilevers vibrating in flexural modes (type 1 and type 2) or in torsion mode.

Quantum metrology with a transmon qutrit

NASA Astrophysics Data System (ADS)

Shlyakhov, A. R.; Zemlyanov, V. V.; Suslov, M. V.; Lebedev, A. V.; Paraoanu, G. S.; Lesovik, G. B.; Blatter, G.

2018-02-01

Making use of coherence and entanglement as metrological quantum resources allows us to improve the measurement precision from the shot-noise or quantum limit to the Heisenberg limit. Quantum metrology then relies on the availability of quantum engineered systems that involve controllable quantum degrees of freedom which are sensitive to the measured quantity. Sensors operating in the qubit mode and exploiting their coherence in a phase-sensitive measurement have been shown to approach the Heisenberg scaling in precision. Here, we show that this result can be further improved by operating the quantum sensor in the qudit mode, i.e., by exploiting d rather than two levels. Specifically, we describe the metrological algorithm for using a superconducting transmon device operating in a qutrit mode as a magnetometer. The algorithm is based on the base-3 semiquantum Fourier transformation and enhances the quantum theoretical performance of the sensor by a factor of 2. Even more, the practical gain of our qutrit implementation is found in a reduction of the number of iteration steps of the quantum Fourier transformation by the factor ln(2 )/ln(3 )≈0.63 compared to the qubit mode. We show that a two-tone capacitively coupled radio-frequency signal is sufficient for implementation of the algorithm.

Evaluation of Time Transfer Units for Time and Frequency Transfer in Optical Fibers Utilizing a Passive Technique Based on SONET/SDH

DTIC Science & Technology

2012-01-01

precision and accuracy. For instance, in international time metrology, two-way satellite time and frequency transfer ( TWSTFT ) (see e.g. [1] and...can act as a time transfer system that is complementary to other high quality systems such as TWSTFT and GPS. REFERENCES [1] J. Levine. “A

Development Towards a Space Qualified Laser Stabilization System in Support of Space-Based Optical Interferometers

NASA Technical Reports Server (NTRS)

Seidel, David J.; Dubovitsky, Serge

2000-01-01

We report on the development, functional performance and space-qualification status of a laser stabilization system supporting a space-based metrology source used to measure changes in optical path lengths in space-based stellar interferometers. The Space Interferometry Mission (SIM) and Deep Space 3 (DS-3) are two missions currently funded by the National Aeronautics and Space Administration (NASA) that are space-based optical interferometers. In order to properly recombine the starlight received at each telescope of the interferometer it is necessary to perform high resolution laser metrology to stabilize the interferometer. A potentially significant error source in performing high resolution metrology length measurements is the potential for fluctuations in the laser gauge itself. If the laser frequency or wavelength is changing over time it will be misinterpreted as a length change in one of the legs of the interferometer. An analysis of the frequency stability requirement for SIM resulted in a fractional frequency stability requirement of square root (S(sub y)(f)) = <2 x 10(exp -12)/square root(Hz) at Fourier frequencies between 10 Hz and 1000 Hz. The DS-3 mission stability requirement is further increased to square root (S(sub y)(f)) = <5 x 10(exp -14)/Square root(Hz) at Fourier frequencies between 0.2 Hz and 10 kHz with a goal of extending the low frequency range to 0.05 Hz. The free running performance of the Lightwave Electronics NPRO lasers, which are the baseline laser for both SIM and DS-3 vary in stability and we have measured them to perform as follows (9 x l0(exp -11)/ f(Hz))(Hz)/square root(Hz)) = <( square root (S(sub y)(f)) = <(1.3 x l0(exp -8)/ f(Hz))/Square root(Hz). In order to improve the frequency stability of the laser we stabilize the laser to a high finesse optical cavity by locking the optical frequency of the laser to one of the transmission modes of the cavity. At JPL we have built a prototype space-qualifiable system meeting the stability requirements of SIM, which has been delivered to one of the SIM testbeds. We have also started on the development of a system to meet the stability needs of DS-3.

Metrology of vibration measurements by laser techniques

NASA Astrophysics Data System (ADS)

von Martens, Hans-Jürgen

2008-06-01

Metrology as the art of careful measurement has been understood as uniform methodology for measurements in natural sciences, covering methods for the consistent assessment of experimental data and a corpus of rules regulating application in technology and in trade and industry. The knowledge, methods and tools available for precision measurements can be exploited for measurements at any level of uncertainty in any field of science and technology. A metrological approach to the preparation, execution and evaluation (including expression of uncertainty) of measurements of translational and rotational motion quantities using laser interferometer methods and techniques will be presented. The realization and dissemination of the SI units of motion quantities (vibration and shock) have been based on laser interferometer methods specified in international documentary standards. New and upgraded ISO standards are reviewed with respect to their suitability for ensuring traceable vibration measurements and calibrations in an extended frequency range of 0.4 Hz to higher than 100 kHz. Using adequate vibration exciters to generate sufficient displacement or velocity amplitudes, the upper frequency limits of the laser interferometer methods specified in ISO 16063-11 for frequencies <= 10 kHz can be expanded to 100 kHz and beyond. A comparison of different methods simultaneously used for vibration measurements at 100 kHz will be demonstrated. A statistical analysis of numerous experimental results proves the highest accuracy achievable currently in vibration measurements by specific laser methods, techniques and procedures (i.e. measurement uncertainty 0.05 % at frequencies <= 10 kHz, <= 1 % up to 100 kHz).

Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry

NASA Astrophysics Data System (ADS)

Supranowitz, Chris; Maloney, Chris; Murphy, Paul; Dumas, Paul

2017-10-01

Recent advances in polishing and metrology have addressed many of the challenges in the fabrication and metrology of freeform surfaces, and the manufacture of these surfaces is possible today. However, achieving the form and mid-spatial frequency (MSF) specifications that are typical of visible imaging systems remains a challenge. Interferometric metrology for freeform surfaces is thus highly desirable for such applications, but the capability is currently quite limited for freeforms. In this paper, we provide preliminary results that demonstrate accurate, high-resolution measurements of freeform surfaces using prototype software on QED's ASI™ (Aspheric Stitching Interferometer).

A laser scanning system for metrology and viewing in ITER

DOE Office of Scientific and Technical Information (OSTI.GOV)

Spampinato, P.T.; Barry, R.E.; Menon, M.M.

1996-05-01

The construction and operation of a next-generation fusion reactor will require metrology to achieve and verify precise alignment of plasma-facing components and inspection in the reactor vessel. The system must be compatible with the vessel environment of high gamma radiation (10{sup 4} Gy/h), ultra-high-vacuum (10{sup {minus}8} torr), and elevated temperature (200 C). The high radiation requires that the system be remotely deployed. A coherent frequency modulated laser radar-based system will be integrated with a remotely operated deployment mechanism to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics tomore » the laser source and imaging units that are located outside of a biological shield. The deployment mechanism will be a mast-like positioning system. Radiation-damage tests will be conducted on critical sensor components at Oak Ridge National Laboratory to determine threshold damage levels and effects on data transmission. This paper identifies the requirements for International Thermonuclear Experimental Reactor metrology and viewing and describes a remotely operated precision ranging and surface mapping system.« less

Flexible resources for quantum metrology

NASA Astrophysics Data System (ADS)

Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

2017-06-01

Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

Development of an ultrasensitive interferometry system as a key to precision metrology applications

NASA Astrophysics Data System (ADS)

Gohlke, Martin; Schuldt, Thilo; Weise, Dennis; Johann, Ulrich; Peters, Achim; Braxmaier, Claus

2009-06-01

We present a symmetric heterodyne interferometer as a prototype of a highly sensitive translation and tilt measurement system. This compact optical metrology system was developed over the past several years by EADS Astrium (Friedrichshafen) in cooperation with the Humboldt-University (Berlin) and the university of applied science Konstanz (HTWG-Konstanz). The noise performance was tested at frequencies between 10-4 and 3 Hz, the noise levels are below 1 nm/Hz 1/2 for translation and below 1 μrad/Hz1/2, for tilt measurements. For frequencies higher than 10 mHz noise levels below 5pm/Hz1/2 and 4 nrad/Hz1/2 respectively, were demonstrated. Based on this highly sensitive metrology system we also developed a dilatometer for the characterization of the CTE (coefficient of thermal expansion) of various materials, i.e. CFRP (carbon fiber reinforced plastic) or Zerodur. The currently achieved sensitivity of these measurements is better than 10-7 K-1. Future planned applications of the interferometer include ultra-high-precision surface profiling and characterization of actuator noise in low-noise opto-mechanics setups. We will give an overview of the current experimental setup and the latest measurement results.

Common mode noise rejection properties of amplitude and phase noise in a heterodyne interferometer.

PubMed

Hechenblaikner, Gerald

2013-05-01

High precision metrology systems based on heterodyne interferometry can measure the position and attitude of objects to accuracies of picometer and nanorad, respectively. A frequently found feature of the general system design is the subtraction of a reference phase from the phase of the position interferometer, which suppresses low frequency common mode amplitude and phase fluctuations occurring in volatile optical path sections shared by both the position and reference interferometer. Spectral components of the noise at frequencies around or higher than the heterodyne frequency, however, are generally transmitted into the measurement band and may limit the measurement accuracy. Detailed analytical calculations complemented with Monte Carlo simulations show that high frequency noise components may also be entirely suppressed, depending on the relative difference of measurement and reference phase, which may be exploited by corresponding design provisions. While these results are applicable to any heterodyne interferometer with certain design characteristics, specific calculations and related discussions are given for the example of the optical metrology system of the LISA Pathfinder mission to space.

On Frequency Combs in Monolithic Resonators

NASA Astrophysics Data System (ADS)

Savchenkov, A. A.; Matsko, A. B.; Maleki, L.

2016-06-01

Optical frequency combs have become indispensable in astronomical measurements, biological fingerprinting, optical metrology, and radio frequency photonic signal generation. Recently demonstrated microring resonator-based Kerr frequency combs point the way towards chip scale optical frequency comb generator retaining major properties of the lab scale devices. This technique is promising for integrated miniature radiofrequency and microwave sources, atomic clocks, optical references and femtosecond pulse generators. Here we present Kerr frequency comb development in a historical perspective emphasizing its similarities and differences with other physical phenomena. We elucidate fundamental principles and describe practical implementations of Kerr comb oscillators, highlighting associated solved and unsolved problems.

Three-dimensional digital holographic aperture synthesis for rapid and highly-accurate large-volume metrology

NASA Astrophysics Data System (ADS)

Crouch, Stephen; Kaylor, Brant M.; Barber, Zeb W.; Reibel, Randy R.

2015-09-01

Currently large volume, high accuracy three-dimensional (3D) metrology is dominated by laser trackers, which typically utilize a laser scanner and cooperative reflector to estimate points on a given surface. The dependency upon the placement of cooperative targets dramatically inhibits the speed at which metrology can be conducted. To increase speed, laser scanners or structured illumination systems can be used directly on the surface of interest. Both approaches are restricted in their axial and lateral resolution at longer stand-off distances due to the diffraction limit of the optics used. Holographic aperture ladar (HAL) and synthetic aperture ladar (SAL) can enhance the lateral resolution of an imaging system by synthesizing much larger apertures by digitally combining measurements from multiple smaller apertures. Both of these approaches only produce two-dimensional imagery and are therefore not suitable for large volume 3D metrology. We combined the SAL and HAL approaches to create a swept frequency digital holographic 3D imaging system that provides rapid measurement speed for surface coverage with unprecedented axial and lateral resolution at longer standoff ranges. The technique yields a "data cube" of Fourier domain data, which can be processed with a 3D Fourier transform to reveal a 3D estimate of the surface. In this paper, we provide the theoretical background for the technique and show experimental results based on an ultra-wideband frequency modulated continuous wave (FMCW) chirped heterodyne ranging system showing ~100 micron lateral and axial precisions at >2 m standoff distances.

The elusive Heisenberg limit in quantum-enhanced metrology

PubMed Central

Demkowicz-Dobrzański, Rafał; Kołodyński, Jan; Guţă, Mădălin

2012-01-01

Quantum precision enhancement is of fundamental importance for the development of advanced metrological optical experiments, such as gravitational wave detection and frequency calibration with atomic clocks. Precision in these experiments is strongly limited by the 1/√N shot noise factor with N being the number of probes (photons, atoms) employed in the experiment. Quantum theory provides tools to overcome the bound by using entangled probes. In an idealized scenario this gives rise to the Heisenberg scaling of precision 1/N. Here we show that when decoherence is taken into account, the maximal possible quantum enhancement in the asymptotic limit of infinite N amounts generically to a constant factor rather than quadratic improvement. We provide efficient and intuitive tools for deriving the bounds based on the geometry of quantum channels and semi-definite programming. We apply these tools to derive bounds for models of decoherence relevant for metrological applications including: depolarization, dephasing, spontaneous emission and photon loss. PMID:22990859

Optical Frequency Metrology of an Iodine-Stabilized He-Ne Laser Using the Frequency Comb of a Quantum-Interference-Stabilized Mode-Locked Laser

PubMed Central

Smith, Ryan P.; Roos, Peter A.; Wahlstrand, Jared K.; Pipis, Jessica A.; Rivas, Maria Belmonte; Cundiff, Steven T.

2007-01-01

We perform optical frequency metrology of an iodine-stabilized He-Ne laser using a mode-locked Ti:sapphire laser frequency comb that is stabilized using quantum interference of photocurrents in a semiconductor. Using this technique, we demonstrate carrier-envelope offset frequency fluctuations of less than 5 mHz using a 1 s gate time. With the resulting stable frequency comb, we measure the optical frequency of the iodine transition [127I2 R(127) 11-5 i component] to be 473 612 214 712.96 ± 0.66 kHz, well within the uncertainty of the CIPM recommended value. The stability of the quantum interference technique is high enough such that it does not limit the measurements. PMID:27110472

The Discrete Nature of the Coherent Synchrotron Radiation

NASA Astrophysics Data System (ADS)

Tammaro, Stefano; Pirali, Olivier; Roy, P.; Lampin, Jean François; Ducourneau, Gaël; Cuisset, Arnaud; Hindle, Francis; Mouret, Gaël

2015-06-01

Frequency Combs (FC) have radically changed the landscape of frequency metrology and high-resolution spectroscopy investigations extending tremendously the achievable resolution while increasing signal to noise ratio. Initially developed in the visible and near-IR spectral regions, the use of FC has been expanded to mid-IR, extreme ultra-violet and X-ray. Significant effort is presently dedicated to the generation of FC at THz frequencies. One solution based on converting a stabilized optical frequency comb using a photoconductive terahertz emitter, remains hampered by the low available THz power. Another approach is based on active mode locked THz quantum-cascade-lasers providing intense FC over a relatively limited spectral extension. Alternatively, we show that dense powerful THz FC is generated over one decade of frequency by coherent synchrotron radiation (CSR). In this mode, the entire ring behaves in a similar fashion to a THz resonator wherein electron bunches emit powerful THz pulses quasi-synchronously. The observed FC has been fully characterized and is demonstrated to be offset free. Based on these recorded specifications and a complete review of existing THz frequency comb, a special attention will be paid onto similarities and differences between them. Udem, Th., Holzwarth, H., Hänsch, T. W., Optical frequency metrology. Nature 416, 233-237 (2002) Schliesser, A., Picqué, N., Hänsch, T. W., Mid-infrared frequency combs. Nature Photon. 6, 440 (2012) Zinkstok, R. Th., Witte, S., Ubachs, W., Hogervorst, W., Eikema, K. S. E., Frequency comb laser spectroscopy in the vacuum-ultraviolet region. Physical Review A 73, 061801 (2006) Cavaletto, S. M. et al. Broadband high-resolution X-ray frequency combs. Nature Photon. 8, 520-523 (2014) Tani, M., Matsuura, S., Sakai, K., Nakashima, S. I., Emission characteristics of photoconductive antennas based on low-temperature-grown GaAs and semi-insulating GaAs. Applied Optics 36, 7853-7859 (1997) Burghoff, D. et al. Terahertz laser frequency combs. Nature Photon. 8, 462-467 (2014)

Design and industrial production of frequency standards in the USSR

NASA Technical Reports Server (NTRS)

Demidov, Nikolai A.; Uljanov, Adolph A.

1990-01-01

Some aspects of research development and production of quantum frequency standards, carried out in QUARTZ Research and Production Association (RPA), Gorky, U.S.S.R., were investigated for the last 25 to 30 years. During this period a number of rubidium and hydrogen frequency standards, based on the active maser, were developed and put into production. The first industrial model of a passive hydrogen maser was designed in the last years. Besides frequency standards for a wide application range, RPA QUARTZ investigates metrological frequency standards--cesium standards with cavity length 1.9 m and hydrogen masers with a flexible storage bulb.

Self-Mixing Thin-Slice Solid-State Laser Metrology

PubMed Central

Otsuka, Kenju

2011-01-01

This paper reviews the dynamic effect of thin-slice solid-state lasers subjected to frequency-shifted optical feedback, which led to the discovery of the self-mixing modulation effect, and its applications to quantum-noise-limited versatile laser metrology systems with extreme optical sensitivity. PMID:22319406

Microfabricated Tactile Sensors for Biomedical Applications: A Review

PubMed Central

Saccomandi, Paola; Schena, Emiliano; Oddo, Calogero Maria; Zollo, Loredana; Silvestri, Sergio; Guglielmelli, Eugenio

2014-01-01

During the last decades, tactile sensors based on different sensing principles have been developed due to the growing interest in robotics and, mainly, in medical applications. Several technological solutions have been employed to design tactile sensors; in particular, solutions based on microfabrication present several attractive features. Microfabrication technologies allow for developing miniaturized sensors with good performance in terms of metrological properties (e.g., accuracy, sensitivity, low power consumption, and frequency response). Small size and good metrological properties heighten the potential role of tactile sensors in medicine, making them especially attractive to be integrated in smart interfaces and microsurgical tools. This paper provides an overview of microfabricated tactile sensors, focusing on the mean principles of sensing, i.e., piezoresistive, piezoelectric and capacitive sensors. These sensors are employed for measuring contact properties, in particular force and pressure, in three main medical fields, i.e., prosthetics and artificial skin, minimal access surgery and smart interfaces for biomechanical analysis. The working principles and the metrological properties of the most promising tactile, microfabricated sensors are analyzed, together with their application in medicine. Finally, the new emerging technologies in these fields are briefly described. PMID:25587432

Microfabricated tactile sensors for biomedical applications: a review.

PubMed

Saccomandi, Paola; Schena, Emiliano; Oddo, Calogero Maria; Zollo, Loredana; Silvestri, Sergio; Guglielmelli, Eugenio

2014-12-01

During the last decades, tactile sensors based on different sensing principles have been developed due to the growing interest in robotics and, mainly, in medical applications. Several technological solutions have been employed to design tactile sensors; in particular, solutions based on microfabrication present several attractive features. Microfabrication technologies allow for developing miniaturized sensors with good performance in terms of metrological properties (e.g., accuracy, sensitivity, low power consumption, and frequency response). Small size and good metrological properties heighten the potential role of tactile sensors in medicine, making them especially attractive to be integrated in smart interfaces and microsurgical tools. This paper provides an overview of microfabricated tactile sensors, focusing on the mean principles of sensing, i.e., piezoresistive, piezoelectric and capacitive sensors. These sensors are employed for measuring contact properties, in particular force and pressure, in three main medical fields, i.e., prosthetics and artificial skin, minimal access surgery and smart interfaces for biomechanical analysis. The working principles and the metrological properties of the most promising tactile, microfabricated sensors are analyzed, together with their application in medicine. Finally, the new emerging technologies in these fields are briefly described.

Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

NASA Astrophysics Data System (ADS)

Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

2018-03-01

The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

Fundamental performance determining factors of the ultrahigh-precision space-borne optical metrology system for the LISA Pathfinder mission

NASA Astrophysics Data System (ADS)

Hechenblaikner, Gerald; Flatscher, Reinhold

2013-05-01

The LISA Pathfinder mission to space employs an optical metrology system (OMS) at its core to measure the distance and attitude between two freely floating test-masses to picometer and nanorad accuracy, respectively, within the measurement band of [1 mHz, 30 mHz]. The OMS is based upon an ultra-stable optical bench with 4 heterodyne interferometers from which interference signals are read-out and processed by a digital phase-meter. Laser frequency noise, power fluctuations and optical path-length variations are suppressed to uncritical levels by dedicated control loops so that the measurement performance approaches the sensor limit imposed by the phasemeter. The system design is such that low frequency common mode noise which affects the read-out phase of all four interferometers is generally well suppressed by subtraction of a reference phase from the other interferometer signals. However, high frequency noise directly affects measurement performance and its common mode rejection depends strongly on the relative signal phases. We discuss how the data from recent test campaigns point towards high frequency phase noise as a likely performance limiting factor which explains some important performance features.

Adhesive Bonding for Optical Metrology Systems in Space Applications

NASA Astrophysics Data System (ADS)

Gohlke, Martin; Schuldt, Thilo; Döringshoff, Klaus; Peters, Achim; Johann, Ulrich; Weise, Dennis; Braxmaier, Claus

2015-05-01

Laser based metrology systems become more and more attractive for space applications and are the core elements of planned missions such as LISA (NGO, eLISA) or NGGM where laser interferometry is used for distance measurements between satellites. The GRACE-FO mission will for the first time demonstrate a Laser Ranging Instrument (LRI) in space, starting 2017. Laser based metrology also includes optical clocks/references, either as ultra-stable light source for high sensitivity interferometry or as scientific payload e.g. proposed in fundamental physics missions such as mSTAR (mini SpaceTime Asymmetry Research), a mission dedicated to perform a Kennedy-Thorndike experiment on a satellite in a low-Earth orbit. To enable the use of existing optical laboratory setups, optimization with respect to power consumption, weight and dimensions is necessary. At the same time the thermal and structural stability must be increased. Over the last few years we investigated adhesive bonding of optical components to thermally highly stable glass ceramics as an easy-to-handle assembly integration technology. Several setups were implemented and tested for potential later use in space applications. We realized a heterodyne LISA related interferometer with demonstrated noise levels in the pm-range for translation measurement and nano-radiant-range for tilt measurements and two iodine frequency references on Elegant Breadboard (EBB) and Engineering Model (EM) level with frequency stabilities in the 10-15 range for longer integration times. The EM setup was thermally cycled and vibration tested.

Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

NASA Astrophysics Data System (ADS)

Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

2016-12-01

The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

Phase-locked, erbium-fiber-laser-based frequency comb in the near infrared.

PubMed

Washburn, Brian R; Diddams, Scott A; Newbury, Nathan R; Nicholson, Jeffrey W; Yan, Man F; Jørgensen, Carsten G

2004-02-01

A phase-locked frequency comb in the near infrared is demonstrated with a mode-locked, erbium-doped, fiber laser whose output is amplified and spectrally broadened in dispersion-flattened, highly nonlinear optical fiber to span from 1100 to >2200 nm. The supercontinuum output comprises a frequency comb with a spacing set by the laser repetition rate and an offset by the carrier-envelope offset frequency, which is detected with the standard f-to-2f heterodyne technique. The comb spacing and offset frequency are phase locked to a stable rf signal with a fiber stretcher in the laser cavity and by control of the pump laser power, respectively. This infrared comb permits frequency metrology experiments in the near infrared in a compact, fiber-laser-based system.

Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

NASA Astrophysics Data System (ADS)

Kim, Hyun-Sok; Hyun, Min-Sung; Ju, Jae-Wuk; Kim, Young-Sik; Lambregts, Cees; van Rhee, Peter; Kim, Johan; McNamara, Elliott; Tel, Wim; Böcker, Paul; Oh, Nang-Lyeom; Lee, Jun-Hyung

2018-03-01

Computational metrology has been proposed as the way forward to resolve the need for increased metrology density, resulting from extending correction capabilities, without adding actual metrology budget. By exploiting TWINSCAN based metrology information, dense overlay fingerprints for every wafer can be computed. This extended metrology dataset enables new use cases, such as monitoring and control based on fingerprints for every wafer of the lot. This paper gives a detailed description, discusses the accuracy of the fingerprints computed, and will show results obtained in a DRAM HVM manufacturing environment. Also an outlook for improvements and extensions will be shared.

Book Review:

NASA Astrophysics Data System (ADS)

Hudson, R. P.

1981-04-01

In July 1976, some thirty young scientists and their lecturers were privileged to participate in a conference on "Metrology and the Fundamental Constants" at Varenna, this being the 68th course in the "Enrico Fermi International School of Physics". Now, at last, we are all privileged to share in that experience—to a large degree—with the appearance of the Proceedings, published last summer under the auspices of the Italian Physical Society. This rather massive volume (800 pages) places in one's hands a summary of the "state of the art" in the greater part of physical metrology. It is not, however, a metrology handbook, designed to assist the unskilled in making trustworthy measurements. It summarizes, via the lectures of internationally-recognized experts, the most recent attempts to realize with enhanced accuracy the basic units of measurement and, in so doing, it presents the subject of measurement science as the central (or all-pervasive) topic in physics itself. Clearly demonstrated is the progress from discovery to "understanding" of physical phenomena which is made possible through the historical alternation of observation and measurement. The volume includes informative reviews of the fundamentals of this fundamental science, namely, the concepts of quantities and units (Allisy); systems of units and the Système International, SI. (Terrien); international aspects of metrology and standards (Terrien); practical considerations in a hierarchy of standards (Terrien); materials problems affecting metrology (Ferro Milone and Sourdo) and statistical methods (Allisy). These discussions alone, being brought together in one place, are of particular usefulness. The remaining, and major, part of the book is taken up by authoritative and generally very readable discussions of measurement topics, for the most part separately focused on one of the base units. For these one cannot help noticing nor refrain from recording a measure of imbalance: some quantities (for example, time and frequency) are accorded several lectures and lecturers, while most receive only one each. That choice by the conference's organizers is not explained in the Foreword. But it is not a very serious drawback; nor—for the anglophone reader, at least—is the appearance here and there of quaint inventions in English which, in fact, add to the charm. There are short articles on the Determination of Atomic Masses of Nuclides (Wapstra), some Problems in Photometry (Korte); two by A Bray on Force Standards, one dealing with Dissemination and the other with Measurement of "g"; Time Scales (Leschiutta); determining the Volume of a Sphere (Terrien); and two by Giacomo, one commenting on Mass Measurements and one discussing the Speed of Light. Of intermediate length are reviews of the Determination of Best Values of the Fundamental Physical Constants (Cohen); Length Measurement Standards (Giacomo), and Topics in Quantum Electrodynamics (Combley and Picasso). The extended treatment of time and frequency metrology includes three major articles by Audoin: a general (largely analytical) one on Frequency Metrology, followed by detailed discussions of Cesium Beam and Hydrogen Maser technology. There are, in addition, specialized treatments of Optically-Pumped Microwave Devices (Arditi) and of Optical Frequency Standards (i.e., lasers) by Chebotayev; finally, a brief note by De Marchi on Problems in Frequency Synthesis in the far Infrared Region. A long article by Petley covers the many-faceted subject of Electrical Metrology and the Fundamental Constants. Equally variegated, although belied by its simple title, is a discussion of Thermometry by Quinn. And last, but not least, is a detailed account by Deslattes of his determination of Avogadro's Constant which ranges over the topics of Infrared to Gamma-ray Reference Wavelengths, Mass and Density. In summarizing it is difficult to avoid the assertion, however hackneyed, that no physicist can afford to be without—or, at least, do without reading—a copy of these Proceedings.

Chip-Scale Architectures for Precise Optical Frequency Synthesis

NASA Astrophysics Data System (ADS)

Yang, Jinghui

Scientists and engineers have investigated various types of stable and accurate optical synthesizers, where mode-locked laser based optical frequency comb synthesizers have been widely investigated. These frequency combs bridge the frequencies from optical domain to microwave domain with orders of magnitude difference, providing a metrological tool for various platforms. The demand for highly robust, scalable, compact and cost-effective femtosecond-laser synthesizers, however, are of great importance for applications in air- or space-borne platforms, where low cost and rugged packaging are particularly required. This has been afforded in the past several years due to breakthroughs in chip-scale nanofabrication, bringing advances in optical frequency combs down to semiconductor chips. These platforms, with significantly enhanced light-matter interaction, provide a fertile sandbox for research rich in nonlinear dynamics, and offer a reliable route towards low-phase noise photonic oscillators, broadband optical frequency synthesizers, miniaturized optical clockwork, and coherent terabit communications. The dissertation explores various types of optical frequency comb synthesizers based on nonlinear microresonators. Firstly, the fundamental mechanism of mode-locking in a high-quality factor microresonator is examined, supported by ultrafast optical characterizations, analytical closed-form solutions and numerical modeling. In the evolution of these frequency microcombs, the key nonlinear dynamical effect governing the comb state coherence is rigorously analyzed. Secondly, a prototype of chip-scale optical frequency synthesizer is demonstrated, with the laser frequency comb stabilized down to instrument-limited 50-mHz RF frequency inaccuracies and 10-16 fractional frequency inaccuracies, near the fundamental limits. Thirdly, a globally stable Turing pattern is achieved and characterized in these nonlinear resonators with high-efficiency conversion, subsequently generating coherent high-power terahertz radiation via plasmonic photomixers. Finally, a new universal modality of frequency combs is discussed, including satellite states, dynamical tunability, and high efficiency conversion towards direct chip-scale optical frequency synthesis at the precision metrology frontiers.

XUV frequency-comb metrology on the ground state of helium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kandula, Dominik Z.; Gohle, Christoph; Pinkert, Tjeerd J.

2011-12-15

The operation of a frequency comb at extreme ultraviolet (xuv) wavelengths based on pairwise amplification and nonlinear upconversion to the 15th harmonic of pulses from a frequency-comb laser in the near-infrared range is reported. It is experimentally demonstrated that the resulting spectrum at 51 nm is fully phase coherent and can be applied to precision metrology. The pulses are used in a scheme of direct-frequency-comb excitation of helium atoms from the ground state to the 1s4p and 1s5p {sup 1} P{sub 1} states. Laser ionization by auxiliary 1064 nm pulses is used to detect the excited-state population, resulting in amore » cosine-like signal as a function of the repetition rate of the frequency comb with a modulation contrast of up to 55%. Analysis of the visibility of this comb structure, thereby using the helium atom as a precision phase ruler, yields an estimated timing jitter between the two upconverted-comb laser pulses of 50 attoseconds, which is equivalent to a phase jitter of 0.38 (6) cycles in the xuv at 51 nm. This sets a quantitative figure of merit for the operation of the xuv comb and indicates that extension to even shorter wavelengths should be feasible. The helium metrology investigation results in transition frequencies of 5 740 806 993 (10) and 5 814 248 672 (6) MHz for excitation of the 1s4p and 1s5p {sup 1} P{sub 1} states, respectively. This constitutes an important frequency measurement in the xuv, attaining high accuracy in this windowless part of the electromagnetic spectrum. From the measured transition frequencies an eight-fold-improved {sup 4}He ionization energy of 5 945 204 212 (6) MHz is derived. Also, a new value for the {sup 4}He ground-state Lamb shift is found of 41 247 (6) MHz. This experimental value is in agreement with recent theoretical calculations up to order m{alpha}{sup 6} and m{sup 2}/M{alpha}{sup 5}, but with a six-times-higher precision, therewith providing a stringent test of quantum electrodynamics in bound two-electron systems.« less

Laser Truss Sensor for Segmented Telescope Phasing

NASA Technical Reports Server (NTRS)

Liu, Duncan T.; Lay, Oliver P.; Azizi, Alireza; Erlig, Herman; Dorsky, Leonard I.; Asbury, Cheryl G.; Zhao, Feng

2011-01-01

A paper describes the laser truss sensor (LTS) for detecting piston motion between two adjacent telescope segment edges. LTS is formed by two point-to-point laser metrology gauges in a crossed geometry. A high-resolution (<30 nm) LTS can be implemented with existing laser metrology gauges. The distance change between the reference plane and the target plane is measured as a function of the phase change between the reference and target beams. To ease the bandwidth requirements for phase detection electronics (or phase meter), homodyne or heterodyne detection techniques have been used. The phase of the target beam also changes with the refractive index of air, which changes with the air pressure, temperature, and humidity. This error can be minimized by enclosing the metrology beams in baffles. For longer-term (weeks) tracking at the micron level accuracy, the same gauge can be operated in the absolute metrology mode with an accuracy of microns; to implement absolute metrology, two laser frequencies will be used on the same gauge. Absolute metrology using heterodyne laser gauges is a demonstrated technology. Complexity of laser source fiber distribution can be optimized using the range-gated metrology (RGM) approach.

EDITORIAL: Award for Patrick Gill

NASA Astrophysics Data System (ADS)

Hauptmann, Peter

2007-12-01

On behalf of the journal I would like to congratulate Professor Patrick Gill, a long-serving member of the Editorial Board for Measurement Science and Technology, who has been awarded the prestigious Institute of Physics Young medal and prize for world-leading contributions to optical frequency metrology. He is recognized as the UK leader in the quest for very accurate optical clocks. Professor Gill's work is concerned with the development of cold trapped ion systems as optical frequency standards with potential for future redefinition of the SI second, and the frequency metrology needed to relate optical and microwave standards to high accuracy. Interested readers may wish to read a short review of the wider state-of-the-art development of single cold trapped ion frequency standards, coupled with a more detailed account of results achieved at the National Physical Laboratory, written by Professor Gill and co-workers from NPL: ''Trapped ion optical frequency standards'' by P Gill, G P Barwood, H A Klein, G Huang, S A Webster, P J Blythe, K Hosaka, S N Lea and H S Margolis 2003 Meas. Sci. Technol. 14 (8) 1174-86 He was one of the very early developers of the frequency comb idea, and in 2004 he led an experiment where the femtosecond laser frequency comb measured the prototype optical clock frequency, based on a strontium-ion optical transition, with accuracy close to the capability of the best caesium microwave clocks. Once again I congratulate Professor Gill and wish him every success for his future work.

The Ampere and Electrical Standards

PubMed Central

Elmquist, Randolph E.; Cage, Marvin E.; Tang, Yi-hua; Jeffery, Anne-Marie; Kinard, Joseph R.; Dziuba, Ronald F.; Oldham, Nile M.; Williams, Edwin R.

2001-01-01

This paper describes some of the major contributions to metrology and physics made by the NIST Electricity Division, which has existed since 1901. It was one of the six original divisions of the National Bureau of Standards. The Electricity Division provides dc and low-frequency calibrations for industrial, scientific, and research organizations, and conducts research on topics related to electrical metrology and fundamental constants. The early work of the Electricity Division staff included the development of precision standards, such as Rosa and Thomas standard resistors and the ac-dc thermal converter. Research contributions helped define the early international system of measurement units and bring about the transition to absolute units based on fundamental principles and physical and dimensional measurements. NIST research has helped to develop and refine electrical standards using the quantum Hall effect and the Josephson effect, which are both based on quantum physics. Four projects covering a number of voltage and impedance measurements are described in detail. Several other areas of current research at NIST are described, including the use of the Internet for international compatibility in metrology, determination of the fine-structure and Planck constants, and construction of the electronic kilogram. PMID:27500018

A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures

NASA Astrophysics Data System (ADS)

Nwokoye, Chidubem A.; Zaghloul, Mona; Cresswell, Michael W.; Allen, Richard A.; Murabito, Christine E.

2006-10-01

The technical objective of the work reported here is to assess whether radio-frequency (RF) measurements made on coplanar waveguide (CPW) test structures, which are replicated in conducting material on insulating substrates, could be employed to extract the critical dimension (CD) of the signal line using its center-to-center separation from the groundlines as a reference. The specific near-term objective is to assess whether this CPW-based CD-metrology has sensitivity and repeatability competitive with the other metrology techniques that are now used for chrome-on-glass (COG) photomasks. An affirmative answer is encouraging because advancing to a non-contact and non-vacuum implementation would then seem possible for this application. Our modeling of specific cases shows that, when the pitch of the replicated lines of the CPW is maintained constant, the sensitivity of its characteristic impedance to the CDs of the signal and ground lines is approximately 60 Ω/μm. This is a potentially useful result. For the same implementation, the quantity ∂C/∂w has a value of approximately 45 (pF/m)/μm, which appears to be large enough to provide acceptable accuracy.

A Josephson radiation comb generator.

PubMed

Solinas, P; Gasparinetti, S; Golubev, D; Giazotto, F

2015-07-20

We propose the implementation of a Josephson Radiation Comb Generator (JRCG) based on a dc superconducting quantum interference device (SQUID) driven by an external magnetic field. When the magnetic flux crosses a diffraction node of the critical current interference pattern, the superconducting phase undergoes a jump of π and a voltage pulse is generated at the extremes of the SQUID. Under periodic drive this allows one to generate a sequence of sharp, evenly spaced voltage pulses. In the frequency domain, this corresponds to a comb-like structure similar to the one exploited in optics and metrology. With this device it is possible to generate up to several hundreds of harmonics of the driving frequency. For example, a chain of 50 identical high-critical-temperature SQUIDs driven at 1 GHz can deliver up to a 0.5 nW at 200 GHz. The availability of a fully solid-state radiation comb generator such as the JRCG, easily integrable on chip, may pave the way to a number of technological applications, from metrology to sub-millimeter wave generation.

Swept Frequency Laser Metrology System

NASA Technical Reports Server (NTRS)

Zhao, Feng (Inventor)

2010-01-01

A swept frequency laser ranging system having sub-micron accuracy that employs multiple common-path heterodyne interferometers, one coupled to a calibrated delay-line for use as an absolute reference for the ranging system. An exemplary embodiment uses two laser heterodyne interferometers to create two laser beams at two different frequencies to measure distance and motions of target(s). Heterodyne fringes generated from reflections off a reference fiducial X(sub R) and measurement (or target) fiducial X(sub M) are reflected back and are then detected by photodiodes. The measured phase changes Delta phi(sub R) and Delta phi (sub m) resulting from the laser frequency swept gives target position. The reference delay-line is the only absolute reference needed in the metrology system and this provides an ultra-stable reference and simple/economical system.

Optical atomic clocks

NASA Astrophysics Data System (ADS)

Poli, N.; Oates, C. W.; Gill, P.; Tino, G. M.

2013-12-01

In the last ten years extraordinary results in time and frequency metrology have been demonstrated. Frequency-stabilization techniques for continuous-wave lasers and femtosecond optical frequency combs have enabled a rapid development of frequency standards based on optical transitions in ultra-cold neutral atoms and trapped ions. As a result, today's best performing atomic clocks tick at an optical rate and allow scientists to perform high-resolution measurements with a precision approaching a few parts in 1018. This paper reviews the history and the state of the art in optical-clock research and addresses the implementation of optical clocks in a possible future redefinition of the SI second as well as in tests of fundamental physics.

Fifty years of atomic time-keeping at VNIIFTRI

NASA Astrophysics Data System (ADS)

Domnin, Yu; Gaigerov, B.; Koshelyaevsky, N.; Poushkin, S.; Rusin, F.; Tatarenkov, V.; Yolkin, G.

2005-06-01

Time metrology in Russia in the second half of the twentieth century has been marked, as in other advanced countries, by the rapid development of time and frequency quantum standards and the beginning of atomic time-keeping. This brief review presents the main developments and studies in time and frequency measurement, and the improvement of accuracy and atomic time-keeping at the VNIIFTRI—the National Metrology Institute keeping primary time and frequency standards and ensuring unification of measurement. The milestones along the way have been the ammonia and hydrogen masers, primary caesium beam and fountain standards and laser frequency standards. For many years, VNIIFTRI was the only world laboratory that applied hydrogen-maser clock ensembles for time-keeping. VNIIFTRI's work on international laser standard frequency comparisons and absolute frequency measurements contributed greatly to the adoption by the CIPM of a highly accurate value for the He-Ne/CH4 laser frequency. VNIIFTRI and the VNIIM were the first to establish a united time, frequency and length standard.

Optical metrology for Starlight Separated Spacecraft Stellar Interferometry Mission

NASA Technical Reports Server (NTRS)

Dubovitsky, S.; Lay, O. P.; Peters, R. D.; Abramovici, A.; Asbury, C. G.; Kuhnert, A. C.; Mulder, J. L.

2002-01-01

We describe a high-precision inter-spacecraft metrology system designed for NASA 's StarLight mission, a space-based separated-spacecraft stellar interferometer. It consists of dual-target linear metrology, based on a heterodyne interferometer with carrier phase modulation, and angular metrology designed to sense the pointing of the laser beam and provides bearing information. The dual-target operation enables one metrology beam to sense displacement of two targets independently. We present the current design, breadboard implementation of the Metrology Subsystem in a stellar interferometer testbed and the present state of development of flight qualifiable subsystem components.

Metrological properties of {CO 2}/{OsO 4} optical frequency standard

NASA Astrophysics Data System (ADS)

Acef, O.

1997-02-01

Recent progress on the metrological performance of the BNM-LPTF {CO 2}/{OsO 4} frequency standards in the {28}/{29}THz range, using OsO 4 molecular transitions as a frequency reference is reported. Significant improvements in terms of both short-term stability ( {6.6×10 -14}/{τup to τ=300s }) and long-term stability (4 × 10 -15 up to τ = 1 000 s, Δν ˜ 0.1 Hz) are obtained. Long term reproducibility (over more than 18 months) of about 3 × 10 -13 has been achieved. This high level enables the transfer, in terms of absolute frequency at the 3 × 10 -13 level of uncertainty, from primary frequency standards in the microwave domain to near infrared and visible domains, using frequency chains with {CO 2}/{OsO 4} as a transfer frequency standard. Preliminary estimates of the main effects which may shift the OsO 4 center line are reported.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, V.V.; Conley, R.; Anderson, E.H.

Verification of the reliability of metrology data from high quality X-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binarypseudo-random (BPR) gratings and arrays has been suggested and and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer. Here we describe the details of development of binarypseudo-random multilayer (BPRML) test samples suitable for characterization of scanning (SEM) and transmission (TEM) electronmore » microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi{sub 2}/Si multilayer coating with pseudo-randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML testsamples can be used to characterize X-ray microscopes. Corresponding work with X-ray microscopes is in progress.« less

Improving the surface metrology accuracy of optical profilers by using multiple measurements

NASA Astrophysics Data System (ADS)

Xu, Xudong; Huang, Qiushi; Shen, Zhengxiang; Wang, Zhanshan

2016-10-01

The performance of high-resolution optical systems is affected by small angle scattering at the mid-spatial-frequency irregularities of the optical surface. Characterizing these irregularities is, therefore, important. However, surface measurements obtained with optical profilers are influenced by additive white noise, as indicated by the heavy-tail effect observable on their power spectral density (PSD). A multiple-measurement method is used to reduce the effects of white noise by averaging individual measurements. The intensity of white noise is determined using a model based on the theoretical PSD of fractal surface measurements with additive white noise. The intensity of white noise decreases as the number of times of multiple measurements increases. Using multiple measurements also increases the highest observed spatial frequency; this increase is derived and calculated. Additionally, the accuracy obtained using multiple measurements is carefully studied, with the analysis of both the residual reference error after calibration, and the random errors appearing in the range of measured spatial frequencies. The resulting insights on the effects of white noise in optical profiler measurements and the methods to mitigate them may prove invaluable to improve the quality of surface metrology with optical profilers.

Absorption line metrology by optical feedback frequency-stabilized cavity ring-down spectroscopy

NASA Astrophysics Data System (ADS)

Burkart, Johannes; Kassi, Samir

2015-04-01

Optical feedback frequency-stabilized cavity ring-down spectroscopy (OFFS-CRDS) is a near-shot-noise-limited technique combining a sensitivity of with a highly linear frequency axis and sub-kHz resolution. Here, we give an in-depth review of the key elements of the experimental setup encompassing a highly stable V-shaped reference cavity, an integrated Mach-Zehnder modulator and a tightly locked ring-down cavity with a finesse of 450,000. Carrying out a detailed analysis of the spectrometer performance and its limitations, we revisit the photo-electron shot-noise limit in CRDS and discuss the impact of optical fringes. We demonstrate different active schemes for fringe cancelation by varying the phase of parasitic reflections. The proof-of-principle experiments reported here include a broadband high-resolution spectrum of carbon dioxide at 1.6 µm and an isolated line-shape measurement with a signal-to-noise ratio of 80,000. Beyond laboratory-based absorption line metrology for fundamental research, OFFS-CRDS holds a considerable potential for field laser measurements of trace gas concentrations and isotopic ratios by virtue of its small sample volume and footprint, the robust cavity-locking scheme and supreme precision.

PREFACE: VII Brazilian Congress on Metrology (Metrologia 2013)

NASA Astrophysics Data System (ADS)

Costa-Félix, Rodrigo; Bernardes, Americo; Valente de Oliveira, José Carlos; Mauro Granjeiro, José; Epsztejn, Ruth; Ihlenfeld, Waldemar; Smarçaro da Cunha, Valnei

2015-01-01

SEVENTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2013) Metrology and Quality for a Sustainable Development From November 24th to 27th 2013 was issued the Seventh Brazilian Congress on Metrology (Metrologia 2013), which is a biannual conference organized and sponsored by the Brazilian Society of Metrology (SBM) and the Brazilian National Institute of Metrology, Quality and Technology (Inmetro). This edition was held in the charming and historical city of Ouro Preto, MG, Brazil, and aimed to join people and institutions devoted to the dissemination of the metrology and conformity assessment. The Metrologia 2013 Conference consisted of Keynote Speeches (7) and regular papers (204). Among the regular papers, the 47 most outstanding ones, comprising a high quality content on Metrology and Conformity Assessment, were selected to be published in this issue of the Journal of Physics: Conference Series. The topics of the conference covered all important areas of Metrology, which were agglutinated in the following sessions in the present issue: . Physical Metrology (Acoustics, Vibration and Ultrasound; Electricity and Magnetism; Mechanics; Optics); . Metrology on Ionizing Radiations; . Time and Frequency; . Chemistry Metrology; . Materials Metrology; . Biotechnology; . Uncertainty, Statistics and Mathematics; . Legal Metrology; . Conformity Assessment. It is our great pleasure to present this volume of IOP Journal of Physics: Conference Series (JPCS) to the scientific community to promote further research in Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by Metrologia 2013. President of the congress Americo Bernardes Federal University of Ouro Preto atb@iceb.ufop.br Editor-in-chief Rodrigo Costa-Félix Brazilian National Institute of Metrology, Quality and Technology rpfelix@inmetro.gov.br Editors José Carlos Valente de Oliveira (Editor on Mechanical Metrology) Brazilian National Institute of Metrology, Quality and Technology jcoliveira@inmetro.gov.br José Mauro Granjeiro (Editor on Biotechnology) Brazilian National Institute of Metrology, Quality and Technology jmgranjeiro@inmetro.gov.br Ruth Epsztejn (Editor on Conformity Assessment) Brazilian National Institute of Metrology, Quality and Technology repsztejn@inmetro.gov.br Waldemar Ihlenfeld (Editor on Electrical Metrology) Brazilian National Institute of Metrology, Quality and Technology wgihlenfeld-pronametro@inmetro.gov.br Valnei Smarçaro da Cunha (Editor on Chemistry Metrology) Brazilian National Institute of Metrology, Quality and Technology vscunha@inmetro.gov.br Technical and Scientific Committee for Metrologia 2013 Ado Jório (UFMG) Carlos Achete (UFRJ, Inmetro) Flávio Vasconcelos (UFMG) Giorgio Moscati (USP) Hans Peter Grieneisen (Inmetro) Humberto Brandi (Inmetro) José Carlos Valente de Oliveira (Inmetro) José Guilherme Pereira Peixoto (IRD) José Mauro Granjeiro (Inmetro) Luiz Claudio Moreira Paschoal (Petrobras) Luis Fernado Rust (Inmetro) Luiz Silva Mello (PUC RJ) Marcos Nogueira Eberlin (Unicamp) Oleksii Kuznetsov (Inmetro) Regis Landim (Inmetro) Ricardo Carvalho (ON) Rodrigo Costa-Felix (Inmetro) Romeu José Daroda (Inmetro) Ruth Epsztejn (Inmetro) Valnei Smarçaro da Cunha (Inmetro) Valter Aibe (Inmetro) Waldemar Guilherme Kürten Ihlenfeld (PTB) Wanderley de Souza (UFRJ, Inmetro)

Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

NASA Astrophysics Data System (ADS)

Kim, Min-Suk; Won, Hwa-Yeon; Jeong, Jong-Mun; Böcker, Paul; Vergaij-Huizer, Lydia; Kupers, Michiel; Jovanović, Milenko; Sochal, Inez; Ryan, Kevin; Sun, Kyu-Tae; Lim, Young-Wan; Byun, Jin-Moo; Kim, Gwang-Gon; Suh, Jung-Joon

2016-03-01

In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrology at the edge of the wafer, to feed field-by-field corrections. Although field-by-field corrections can be effective in reducing localized overlay errors, the requirement for dense metrology to determine the corrections can become a limiting factor due to a significant increase of metrology time and cost. In this study, a more cost-effective solution has been found in extending the regular correction model with an edge-specific component. This new overlay correction model can be driven by an optimized, sparser sampling especially at the wafer edge area, and also allows for a reduction of noise propagation. Lithography correction potential has been maximized, with significantly less metrology needs. Evaluations have been performed, demonstrating the benefit of edge models in terms of on-product overlay performance, as well as cell based overlay performance based on metrology-to-cell matching improvements. Performance can be increased compared to POR modeling and sampling, which can contribute to (overlay based) yield improvement. Based on advanced modeling including edge components, metrology requirements have been optimized, enabling integrated metrology which drives down overall metrology fab footprint and lithography cycle time.

A stabilized optical frequency comb based on an Er-doped fiber femtosecond laser

NASA Astrophysics Data System (ADS)

Xia, Chuanqing; Wu, Tengfei; Zhao, Chunbo; Xing, Shuai

2018-03-01

An optical frequency comb based on a 250 MHz home-made Er-doped fiber femtosecond laser is presented in this paper. The Er-doped fiber laser has a ring cavity and operates mode-locked in femtosecond regime with the technique of nonlinear polarization rotation. The pulse duration is 118 fs and the spectral width is 30 nm. A part of the femtosecond laser is amplified in Er-doped fiber amplifier before propagating through a piece of highly nonlinear fiber for expanding the spectrum. The carrier-envelope offset frequency of the comb which has a signal-to-noise ratio more than 35 dB is extracted by means of f-2f beating. It demonstrates that both carrier-envelope offset frequency and repetition frequency keep phase locked to a Rubidium atomic clock simultaneously for 2 hours. The frequency stabilized fiber combs will be increasingly applied in optical metrology, attosecond pulse generation, and absolute distance measurement.

Robust, frequency-stable and accurate mid-IR laser spectrometer based on frequency comb metrology of quantum cascade lasers up-converted in orientation-patterned GaAs.

PubMed

Hansen, Michael G; Ernsting, Ingo; Vasilyev, Sergey V; Grisard, Arnaud; Lallier, Eric; Gérard, Bruno; Schiller, Stephan

2013-11-04

We demonstrate a robust and simple method for measurement, stabilization and tuning of the frequency of cw mid-infrared (MIR) lasers, in particular of quantum cascade lasers. The proof of principle is performed with a quantum cascade laser at 5.4 µm, which is upconverted to 1.2 µm by sum-frequency generation in orientation-patterned GaAs with the output of a standard high-power cw 1.5 µm fiber laser. Both the 1.2 µm and the 1.5 µm waves are measured by a standard Er:fiber frequency comb. Frequency measurement at the 100 kHz-level, stabilization to sub-10 kHz level, controlled frequency tuning and long-term stability are demonstrated.

Recent results of the pulsed optically pumped rubidium clock

NASA Astrophysics Data System (ADS)

Levi, F.; Micalizio, S.; Godone, A.; Calosso, C.; Bertacco, E.

2017-11-01

A laboratory prototype of a pulsed optically pumped (POP) clock based on a rubidium cell with buffer gas is described. This clock has shown very interesting physical and metrological features, such as negligible light-shift, strongly reduced cavity-pulling and very good frequency stability. In this regard, an Allan deviation of σy(τ) = 1.2 τ-1/2 for measurement times up to τ = 105 s has been measured. These results confirm the interesting perspectives of such a frequency standard and make it very attractive for several technological applications, such as radionavigation.

Metrology measurements for large-aperture VPH gratings

NASA Astrophysics Data System (ADS)

Zheng, Jessica R.; Gers, Luke; Heijmans, Jeroen

2013-09-01

The High Efficiency and Resolution Multi Element Spectrograph (HERMES) for the Australian Astronomical Observatory (AAO) uses four large aperture, high angle of incidence volume phase holographic gratings (VPHG) for high resolution `Galactic archaeology' spectroscopy. The large clear aperture, the high diffraction efficiency, the line frequency homogeneity, and mosaic alignment made manufacturing and testing challenging. We developed new metrology systems at the AAO to verify the performance of these VPH gratings. The measured diffraction efficiencies and line frequency of the VPH gratings received so far meet the vendor's provided data. The wavefront quality for the Blue VPH grating is good but the Green and Red VPH gratings need to be post polishing.

An Optical Frequency Comb Tied to GPS for Laser Frequency/Wavelength Calibration

PubMed Central

Stone, Jack A.; Egan, Patrick

2010-01-01

Optical frequency combs can be employed over a broad spectral range to calibrate laser frequency or vacuum wavelength. This article describes procedures and techniques utilized in the Precision Engineering Division of NIST (National Institute of Standards and Technology) for comb-based calibration of laser wavelength, including a discussion of ancillary measurements such as determining the mode order. The underlying purpose of these calibrations is to provide traceable standards in support of length measurement. The relative uncertainty needed to fulfill this goal is typically 10−8 and never below 10−12, very modest requirements compared to the capabilities of comb-based frequency metrology. In this accuracy range the Global Positioning System (GPS) serves as an excellent frequency reference that can provide the traceable underpinning of the measurement. This article describes techniques that can be used to completely characterize measurement errors in a GPS-based comb system and thus achieve full confidence in measurement results. PMID:27134794

The National Time and Frequency Service of the Russian Federation

DTIC Science & Technology

2004-09-01

Krutikov Gosstandard of Russia, Moscow 119991, Russia V. Kostromin and N. Koshelyaevsky Institute of Metrology for Time and Space FGUP “ VNIIFTRI ...Metrology for Time and Space FGUP VNIIFTRI Mendeleevo 141570, Russia 8. PERFORMING ORGANIZATION REPORT NUMBER 9. SPONSORING/MONITORING AGENCY NAME(S) AND...is supplied from reserved sources located in premises outside the main territory of VNIIFTRI . According to the State Traceability Chart for Time

Stable integrated hyper-parametric oscillator based on coupled optical microcavities.

PubMed

Armaroli, Andrea; Feron, Patrice; Dumeige, Yannick

2015-12-01

We propose a flexible scheme based on three coupled optical microcavities that permits us to achieve stable oscillations in the microwave range, the frequency of which depends only on the cavity coupling rates. We find that the different dynamical regimes (soft and hard excitation) affect the oscillation intensity, but not their periods. This configuration may permit us to implement compact hyper-parametric sources on an integrated optical circuit with interesting applications in communications, sensing, and metrology.

Long distance measurement with a femtosecond laser based frequency comb

NASA Astrophysics Data System (ADS)

Bhattacharya, N.; Cui, M.; Zeitouny, M. G.; Urbach, H. P.; van den Berg, S. A.

2017-11-01

Recent advances in the field of ultra-short pulse lasers have led to the development of reliable sources of carrier envelope phase stabilized femtosecond pulses. The pulse train generated by such a source has a frequency spectrum that consists of discrete, regularly spaced lines known as a frequency comb. In this case both the frequency repetition and the carrier-envelope-offset frequency are referenced to a frequency standard, like an atomic clock. As a result the accuracy of the frequency standard is transferred to the optical domain, with the frequency comb as transfer oscillator. These unique properties allow the frequency comb to be applied as a versatile tool, not only for time and frequency metrology, but also in fundamental physics, high-precision spectroscopy, and laser noise characterization. The pulse-to-pulse phase relationship of the light emitted by the frequency comb has opened up new directions for long range highly accurate distance measurement.

Legal Time of the Republic of Colombia and its international traceability using the Cesium Atomic Clock - Time and Frequency National Standard

NASA Astrophysics Data System (ADS)

Hernández Forero, Liz Catherine; Bahamón Cortés, Nelson

2017-06-01

Around the world, there are different providers of timestamp (mobile, radio or television operators, satellites of the GPS network, astronomical measurements, etc.), however, the source of the legal time for a country is either the national metrology institute or another designated laboratory. This activity requires a time standard based on an atomic time scale. The International Bureau of Weights and Measures (BIPM) calculates a weighted average of the time kept in more than 60 nations and produces a single international time scale, called Coordinated Universal Time (UTC). This article presents the current time scale that generates Legal Time for the Republic of Colombia produced by the Instituto Nacional de Metrología (INM) using the time and frequency national standard, a cesium atomic oscillator. It also illustrates how important it is for the academic, scientific and industrial communities, as well as the general public, to be synchronized with this time scale, which is traceable to the International System (SI) of units, through international comparisons that are made in real time.

Base units of the SI, fundamental constants and modern quantum physics.

PubMed

Bordé, Christian J

2005-09-15

Over the past 40 years, a number of discoveries in quantum physics have completely transformed our vision of fundamental metrology. This revolution starts with the frequency stabilization of lasers using saturation spectroscopy and the redefinition of the metre by fixing the velocity of light c. Today, the trend is to redefine all SI base units from fundamental constants and we discuss strategies to achieve this goal. We first consider a kinematical frame, in which fundamental constants with a dimension, such as the speed of light c, the Planck constant h, the Boltzmann constant k(B) or the electron mass m(e) can be used to connect and redefine base units. The various interaction forces of nature are then introduced in a dynamical frame, where they are completely characterized by dimensionless coupling constants such as the fine structure constant alpha or its gravitational analogue alpha(G). This point is discussed by rewriting the Maxwell and Dirac equations with new force fields and these coupling constants. We describe and stress the importance of various quantum effects leading to the advent of this new quantum metrology. In the second part of the paper, we present the status of the seven base units and the prospects of their possible redefinitions from fundamental constants in an experimental perspective. The two parts can be read independently and they point to these same conclusions concerning the redefinitions of base units. The concept of rest mass is directly related to the Compton frequency of a body, which is precisely what is measured by the watt balance. The conversion factor between mass and frequency is the Planck constant, which could therefore be fixed in a realistic and consistent new definition of the kilogram based on its Compton frequency. We discuss also how the Boltzmann constant could be better determined and fixed to replace the present definition of the kelvin.

From quantum transitions to electronic motions

NASA Astrophysics Data System (ADS)

Krausz, Ferenc

2017-01-01

Laser spectroscopy and chromoscopy permit precision measurement of quantum transitions and captures atomic-scale dynamics, respectively. Frequency- and time-domain metrology ranks among the supreme laser disciplines in fundamental science. For decades, these fields evolved independently, without interaction and synergy between them. This has changed profoundly with controlling the position of the equidistant frequency spikes of a mode-locked laser oscillator. By the self-referencing technique invented by Theodor Hänsch, the comb can be coherently linked to microwaves and used for precision measurements of energy differences between quantum states. The resultant optical frequency synthesis has revolutionized precision spectroscopy. Locking the comb lines to the resonator round-trip frequency by the same approach has given rise to laser pulses with controlled field oscillations. This article reviews, from a personal perspective, how the bridge between frequency- and time-resolved metrology emerged on the turn of the millennium and how synthesized several-cycle laser fields have been instrumental in establishing the basic tools and techniques for attosecond science.

Correlation methods in optical metrology with state-of-the-art x-ray mirrors

NASA Astrophysics Data System (ADS)

Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

2018-01-01

The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of <100 nrad (root-mean-square) and height error of <1-2 nm (peak-tovalley). These are for optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

European PTTI report

NASA Technical Reports Server (NTRS)

Cordara, Franco; Grimaldi, Sabrina; Leschiutta, Sigfrido

1994-01-01

Time and frequency metrology in Europe presents some peculiar features in its three main components: research on clocks, comparisons and dissemination methods, and dissemination services. Apart from the usual activities of the national metrological laboratories, an increasing number of cooperation between the European countries are promoted inside some European organizations, such as the ECC, EFTA, EUROMET, and WECC. Cooperation between these organizations is covered. The present, evolving situation will be further influenced by the recent political changes in Eastern Europe.

DOE Office of Scientific and Technical Information (OSTI.GOV)

V Yashchuk; R Conley; E Anderson

Verification of the reliability of metrology data from high quality X-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays has been suggested [1] and [2] and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer [5]. Here we describe the details of development of binary pseudo-random multilayer (BPRML) test samples suitable for characterization of scanningmore » (SEM) and transmission (TEM) electron microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi2/Si multilayer coating with pseudo-randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize X-ray microscopes. Corresponding work with X-ray microscopes is in progress.« less

Mode-resolved frequency comb interferometry for high-accuracy long distance measurement

PubMed Central

van den Berg, Steven. A.; van Eldik, Sjoerd; Bhattacharya, Nandini

2015-01-01

Optical frequency combs have developed into powerful tools for distance metrology. In this paper we demonstrate absolute long distance measurement using a single femtosecond frequency comb laser as a multi-wavelength source. By applying a high-resolution spectrometer based on a virtually imaged phased array, the frequency comb modes are resolved spectrally to the level of an individual mode. Having the frequency comb stabilized against an atomic clock, thousands of accurately known wavelengths are available for interferometry. From the spectrally resolved output of a Michelson interferometer a distance is derived. The presented measurement method combines spectral interferometry, white light interferometry and multi-wavelength interferometry in a single scheme. Comparison with a fringe counting laser interferometer shows an agreement within <10−8 for a distance of 50 m. PMID:26419282

X-ray free-electron laser oscillator with nuclear-resonant cavity stabilization and quantum-optical applications

DOE PAGES

Adams, Bernhard W.; Kim, Kwang -Je

2016-08-09

Here, x-ray free-electron-laser oscillators with nuclear-resonant cavity stabilization (NRS-XFELO) hold the promise for providing x-rays with unprecedented coherence properties that will enable interesting quantum-optical and metrological applications. Among these are atom optics with x-ray-based optical elements providing high momentum transfer, or a frequency standard far surpassing the best state-of the-art atomic clocks.

Optical Performance Modeling of FUSE Telescope Mirror

NASA Technical Reports Server (NTRS)

Saha, Timo T.; Ohl, Raymond G.; Friedman, Scott D.; Moos, H. Warren

2000-01-01

We describe the Metrology Data Processor (METDAT), the Optical Surface Analysis Code (OSAC), and their application to the image evaluation of the Far Ultraviolet Spectroscopic Explorer (FUSE) mirrors. The FUSE instrument - designed and developed by the Johns Hopkins University and launched in June 1999 is an astrophysics satellite which provides high resolution spectra (lambda/Delta(lambda) = 20,000 - 25,000) in the wavelength region from 90.5 to 118.7 nm The FUSE instrument is comprised of four co-aligned, normal incidence, off-axis parabolic mirrors, four Rowland circle spectrograph channels with holographic gratings, and delay line microchannel plate detectors. The OSAC code provides a comprehensive analysis of optical system performance, including the effects of optical surface misalignments, low spatial frequency deformations described by discrete polynomial terms, mid- and high-spatial frequency deformations (surface roughness), and diffraction due to the finite size of the aperture. Both normal incidence (traditionally infrared, visible, and near ultraviolet mirror systems) and grazing incidence (x-ray mirror systems) systems can be analyzed. The code also properly accounts for reflectance losses on the mirror surfaces. Low frequency surface errors are described in OSAC by using Zernike polynomials for normal incidence mirrors and Legendre-Fourier polynomials for grazing incidence mirrors. The scatter analysis of the mirror is based on scalar scatter theory. The program accepts simple autocovariance (ACV) function models or power spectral density (PSD) models derived from mirror surface metrology data as input to the scatter calculation. The end product of the program is a user-defined pixel array containing the system Point Spread Function (PSF). The METDAT routine is used in conjunction with the OSAC program. This code reads in laboratory metrology data in a normalized format. The code then fits the data using Zernike polynomials for normal incidence systems or Legendre-Fourier polynomials for grazing incidence systems. It removes low order terms from the metrology data, calculates statistical ACV or PSD functions, and fits these data to OSAC models for the scatter analysis. In this paper we briefly describe the laboratory image testing of FUSE spare mirror performed in the near and vacuum ultraviolet at John Hopkins University and OSAC modeling of the test setup performed at NASA/GSFC. The test setup is a double-pass configuration consisting of a Hg discharge source, the FUSE off-axis parabolic mirror under test, an autocollimating flat mirror, and a tomographic imaging detector. Two additional, small fold flats are used in the optical train to accommodate the light source and the detector. The modeling is based on Zernike fitting and PSD analysis of surface metrology data measured by both the mirror vendor (Tinsley) and JHU. The results of our models agree well with the laboratory imaging data, thus validating our theoretical model. Finally, we predict the imaging performance of FUSE mirrors in their flight configuration at far-ultraviolet wavelengths.

1998 Conference on Precision Electromagnetic Measurements Digest. Proceedings.

NASA Astrophysics Data System (ADS)

Nelson, T. L.

The following topics were dealt with: fundamental constants; caesium standards; AC-DC transfer; impedance measurement; length measurement; units; statistics; cryogenic resonators; time transfer; QED; resistance scaling and bridges; mass measurement; atomic fountains and clocks; single electron transport; Newtonian constant of gravitation; stabilised lasers and frequency measurements; cryogenic current comparators; optical frequency standards; high voltage devices and systems; international compatibility; magnetic measurement; precision power measurement; high resolution spectroscopy; DC transport standards; waveform acquisition and analysis; ion trap standards; optical metrology; quantised Hall effect; Josephson array comparisons; signal generation and measurement; Avogadro constant; microwave networks; wideband power standards; antennas, fields and EMC; quantum-based standards.

A large-scale magnetic shield with 10{sup 6} damping at millihertz frequencies

DOE Office of Scientific and Technical Information (OSTI.GOV)

Altarev, I.; Bales, M.; Fierlinger, K.

We present a magnetically shielded environment with a damping factor larger than 1 × 10{sup 6} at the mHz frequency regime and an extremely low field and gradient over an extended volume. This extraordinary shielding performance represents an improvement of the state-of-the-art in the difficult regime of damping very low-frequency distortions by more than an order of magnitude. This technology enables a new generation of high-precision measurements in fundamental physics and metrology, including searches for new physics far beyond the reach of accelerator-based experiments. We discuss the technical realization of the shield with its improvements in design.

Dispersion compensated mid-infrared quantum cascade laser frequency comb with high power output

NASA Astrophysics Data System (ADS)

Lu, Q. Y.; Manna, S.; Slivken, S.; Wu, D. H.; Razeghi, M.

2017-04-01

Chromatic dispersion control plays an underlying role in optoelectronics and spectroscopy owing to its enhancement to nonlinear interactions by reducing the phase mismatching. This is particularly important to optical frequency combs based on quantum cascade lasers which require negligible dispersions for efficient mode locking of the dispersed modes into equally spaced comb modes. Here, we demonstrated a dispersion compensated mid-IR quantum cascade laser frequency comb with high power output at room temperature. A low-loss dispersive mirror has been engineered to compensate the device's dispersion residue for frequency comb generation. Narrow intermode beating linewidths of 40 Hz in the comb-working currents were identified with a high power output of 460 mW and a broad spectral coverage of 80 cm-1. This dispersion compensation technique will enable fast spectroscopy and high-resolution metrology based on QCL combs with controlled dispersion and suppressed noise.

The ACES mission: scientific objectives and present status

NASA Astrophysics Data System (ADS)

Cacciapuoti, L.; Dimarcq, N.; Salomon, C.

2017-11-01

"Atomic Clock Ensemble in Space" (ACES) is a mission in fundamental physics that will operate a new generation of atomic clocks in the microgravity environment of the International Space Station (ISS). The ACES clock signal will combine the medium term frequency stability of a space hydrogen maser (SHM) and the long term stability and accuracy of a frequency standard based on cold cesium atoms (PHARAO). Fractional frequency stability and accuracy of few parts in 1016 will be achieved. The on-board time base distributed on Earth via a microwave link (MWL) will be used to test fundamental laws of physics (Einstein's theories of Special and General Relativity, Standard Model Extension, string theories…) and to develop applications in time and frequency metrology, universal time scales, global positioning and navigation, geodesy and gravimetry. After a general overview on the mission concept and its scientific objectives, the present status of ACES instruments and sub-systems will be discussed.

Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Arpaia, P., E-mail: pasquale.arpaia@unina.it; Technology Department, European Organization for Nuclear Research; Girone, M., E-mail: mario.girone@cern.ch

2015-12-15

The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sourcesmore » most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.« less

Toward reliable and repeatable automated STEM-EDS metrology with high throughput

NASA Astrophysics Data System (ADS)

Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

2018-03-01

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians.

PubMed

Pang, Shengshi; Jordan, Andrew N

2017-03-09

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T 2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T 4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case.

The SIM Time Network

PubMed Central

Lombardi, Michael A.; Novick, Andrew N.; Lopez R, J. Mauricio; Jimenez, Francisco; de Carlos Lopez, Eduardo; Boulanger, Jean-Simon; Pelletier, Raymond; de Carvalho, Ricardo J.; Solis, Raul; Sanchez, Harold; Quevedo, Carlos Andres; Pascoe, Gregory; Perez, Daniel; Bances, Eduardo; Trigo, Leonardo; Masi, Victor; Postigo, Henry; Questelles, Anthony; Gittens, Anselm

2011-01-01

The Sistema Interamericano de Metrologia (SIM) is a regional metrology organization (RMO) whose members are the national metrology institutes (NMIs) located in the 34 nations of the Organization of American States (OAS). The SIM/OAS region extends throughout North, Central, and South America and the Caribbean Islands. About half of the SIM NMIs maintain national standards of time and frequency and must participate in international comparisons in order to establish metrological traceability to the International System (SI) of units. The SIM time network (SIMTN) was developed as a practical, cost effective, and technically sound way to automate these comparisons. The SIMTN continuously compares the time standards of SIM NMIs and produces measurement results in near real-time by utilizing the Internet and the Global Positioning System (GPS). Fifteen SIM NMIs have joined the network as of December 2010. This paper provides a brief overview of SIM and a technical description of the SIMTN. It presents international comparison results and examines the measurement uncertainties. It also discusses the metrological benefits that the network provides to its participants. PMID:26989584

The SIM Time Network.

PubMed

Lombardi, Michael A; Novick, Andrew N; Lopez R, J Mauricio; Jimenez, Francisco; de Carlos Lopez, Eduardo; Boulanger, Jean-Simon; Pelletier, Raymond; de Carvalho, Ricardo J; Solis, Raul; Sanchez, Harold; Quevedo, Carlos Andres; Pascoe, Gregory; Perez, Daniel; Bances, Eduardo; Trigo, Leonardo; Masi, Victor; Postigo, Henry; Questelles, Anthony; Gittens, Anselm

2011-01-01

The Sistema Interamericano de Metrologia (SIM) is a regional metrology organization (RMO) whose members are the national metrology institutes (NMIs) located in the 34 nations of the Organization of American States (OAS). The SIM/OAS region extends throughout North, Central, and South America and the Caribbean Islands. About half of the SIM NMIs maintain national standards of time and frequency and must participate in international comparisons in order to establish metrological traceability to the International System (SI) of units. The SIM time network (SIMTN) was developed as a practical, cost effective, and technically sound way to automate these comparisons. The SIMTN continuously compares the time standards of SIM NMIs and produces measurement results in near real-time by utilizing the Internet and the Global Positioning System (GPS). Fifteen SIM NMIs have joined the network as of December 2010. This paper provides a brief overview of SIM and a technical description of the SIMTN. It presents international comparison results and examines the measurement uncertainties. It also discusses the metrological benefits that the network provides to its participants.

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians

PubMed Central

Pang, Shengshi; Jordan, Andrew N.

2017-01-01

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case. PMID:28276428

Compact sub-kilohertz low-frequency quantum light source based on four-wave mixing in cesium vapor

NASA Astrophysics Data System (ADS)

Ma, Rong; Liu, Wei; Qin, Zhongzhong; Su, Xiaolong; Jia, Xiaojun; Zhang, Junxiang; Gao, Jiangrui

2018-03-01

Using a nondegenerate four-wave mixing (FWM) process based on a double-{\\Lambda} scheme in hot cesium vapor, we demonstrate a compact diode-laser-pumped quantum light source for the generation of quantum correlated twin beams with a maximum squeezing of 6.5 dB. The squeezing is observed at a Fourier frequency in the audio band down to 0.7 kHz which, to the best of our knowledge, is the first observation of sub-kilohertz intensity-difference squeezing in an atomic system so far. A phase-matching condition is also investigated in our system, which confirms the spatial-multi-mode characteristics of the FWM process. Our compact low-frequency squeezed light source may find applications in quantum imaging, quantum metrology, and the transfer of optical squeezing onto a matter wave.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, V. V.; Fischer, P. J.; Chan, E. R.

We present a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) one-dimensional sequences and two-dimensional arrays as an effective method for spectral characterization in the spatial frequency domain of a broad variety of metrology instrumentation, including interferometric microscopes, scatterometers, phase shifting Fizeau interferometers, scanning and transmission electron microscopes, and at this time, x-ray microscopes. The inherent power spectral density of BPR gratings and arrays, which has a deterministic white-noise-like character, allows a direct determination of the MTF with a uniform sensitivity over the entire spatial frequency range and field of view of an instrument. We demonstrate themore » MTF calibration and resolution characterization over the full field of a transmission soft x-ray microscope using a BPR multilayer (ML) test sample with 2.8 nm fundamental layer thickness. We show that beyond providing a direct measurement of the microscope's MTF, tests with the BPRML sample can be used to fine tune the instrument's focal distance. Finally, our results confirm the universality of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, V. V., E-mail: VVYashchuk@lbl.gov; Chan, E. R.; Lacey, I.

We present a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) one-dimensional sequences and two-dimensional arrays as an effective method for spectral characterization in the spatial frequency domain of a broad variety of metrology instrumentation, including interferometric microscopes, scatterometers, phase shifting Fizeau interferometers, scanning and transmission electron microscopes, and at this time, x-ray microscopes. The inherent power spectral density of BPR gratings and arrays, which has a deterministic white-noise-like character, allows a direct determination of the MTF with a uniform sensitivity over the entire spatial frequency range and field of view of an instrument. We demonstrate themore » MTF calibration and resolution characterization over the full field of a transmission soft x-ray microscope using a BPR multilayer (ML) test sample with 2.8 nm fundamental layer thickness. We show that beyond providing a direct measurement of the microscope’s MTF, tests with the BPRML sample can be used to fine tune the instrument’s focal distance. Our results confirm the universality of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.« less

The correction of vibration in frequency scanning interferometry based absolute distance measurement system for dynamic measurements

NASA Astrophysics Data System (ADS)

Lu, Cheng; Liu, Guodong; Liu, Bingguo; Chen, Fengdong; Zhuang, Zhitao; Xu, Xinke; Gan, Yu

2015-10-01

Absolute distance measurement systems are of significant interest in the field of metrology, which could improve the manufacturing efficiency and accuracy of large assemblies in fields such as aircraft construction, automotive engineering, and the production of modern windmill blades. Frequency scanning interferometry demonstrates noticeable advantages as an absolute distance measurement system which has a high precision and doesn't depend on a cooperative target. In this paper , the influence of inevitable vibration in the frequency scanning interferometry based absolute distance measurement system is analyzed. The distance spectrum is broadened as the existence of Doppler effect caused by vibration, which will bring in a measurement error more than 103 times bigger than the changes of optical path difference. In order to decrease the influence of vibration, the changes of the optical path difference are monitored by a frequency stabilized laser, which runs parallel to the frequency scanning interferometry. The experiment has verified the effectiveness of this method.

Fully stabilized mid-infrared frequency comb for high-precision molecular spectroscopy.

PubMed

Vainio, Markku; Karhu, Juho

2017-02-20

A fully stabilized mid-infrared optical frequency comb spanning from 2.9 to 3.4 µm is described in this article. The comb is based on half-harmonic generation in a femtosecond optical parametric oscillator, which transfers the high phase coherence of a fully stabilized near-infrared Er-doped fiber laser comb to the mid-infrared region. The method is simple, as no phase-locked loops or reference lasers are needed. Precise locking of optical frequencies of the mid-infrared comb to the pump comb is experimentally verified at sub-20 mHz level, which corresponds to a fractional statistical uncertainty of 2 × 10^-16 at the center frequency of the mid-infrared comb. The fully stabilized mid-infrared comb is an ideal tool for high-precision molecular spectroscopy, as well as for optical frequency metrology in the mid-infrared region, which is difficult to access with other stabilized frequency comb techniques.

Frequency Standards and Metrology

NASA Astrophysics Data System (ADS)

Maleki, Lute

2009-04-01

Preface / Lute Maleki -- Symposium history / Jacques Vanier -- Symposium photos -- pt. I. Fundamental physics. Variation of fundamental constants from the big bang to atomic clocks: theory and observations (Invited) / V. V. Flambaum and J. C. Berengut. Alpha-dot or not: comparison of two single atom optical clocks (Invited) / T. Rosenband ... [et al.]. Variation of the fine-structure constant and laser cooling of atomic dysprosium (Invited) / N. A. Leefer ... [et al.]. Measurement of short range forces using cold atoms (Invited) / F. Pereira Dos Santos ... [et al.]. Atom interferometry experiments in fundamental physics (Invited) / S. W. Chiow ... [et al.]. Space science applications of frequency standards and metrology (Invited) / M. Tinto -- pt. II. Frequency & metrology. Quantum metrology with lattice-confined ultracold Sr atoms (Invited) / A. D. Ludlow ... [et al.]. LNE-SYRTE clock ensemble: new [symbol]Rb hyperfine frequency measurement - spectroscopy of [symbol]Hg optical clock transition (Invited) / M. Petersen ... [et al.]. Precise measurements of S-wave scattering phase shifts with a juggling atomic clock (Invited) / S. Gensemer ... [et al.]. Absolute frequency measurement of the [symbol] clock transition (Invited) / M. Chwalla ... [et al.]. The semiclassical stochastic-field/atom interaction problem (Invited) / J. Camparo. Phase and frequency noise metrology (Invited) / E. Rubiola ... [et al.]. Optical spectroscopy of atomic hydrogen for an improved determination of the Rydberg constant / J. L. Flowers ... [et al.] -- pt. III. Clock applications in space. Recent progress on the ACES mission (Invited) / L. Cacciapuoti and C. Salomon. The SAGAS mission (Invited) / P. Wolf. Small mercury microwave ion clock for navigation and radioScience (Invited) / J. D. Prestage ... [et al.]. Astro-comb: revolutionizing precision spectroscopy in astrophysics (Invited) / C. E. Kramer ... [et al.]. High frequency very long baseline interferometry: frequency standards and imaging an event horizon (Invited) / S. Doeleman. Optically-pumped space cesium clock for Galileo: results of the breadboard / R. Ruffieux ... [et al.] -- pt. IV. Optical clocks I: lattice clocks. Optical lattice clock: seven years of progress and next steps (Invited) / H. Katori, M. Takamoto and T. Akatsuka. The Yb optical lattice clock (Invited) / N. D. Demke ... [et al.]. Optical Lattice clock with Sr atoms (Invited) / P. G. Westergaard ... [et al.]. Development of an optical clock based on neutral strontium atoms held in a lattice trap / E. A. Curtis ... [et al.]. Decoherence and losses by collisions in a [symbol]Sr lattice clock / J. S. R. Vellore Winfred ... [et al.]. Lattice Yb optical clock and cryogenic Cs fountain at INRIM / F. Levi ... [et al.] -- pt. V. Optical clocks II: ion clocks. [Symbol]Yb+ single-ion optical frequency standards (Invited) / Chr. Tamm ... [et al.]. An optical clock based on a single trapped [symbol]Sr+ ion (Invited) / H. S. Margolis ... [et al.]. A trapped [symbol]Yb+ ion optical frequency standard based on the [symbol] transition (Invited) / P. Gill ... [et al.]. Overview of highly accurate RF and optical frequency standards at the National Research Council of Canada (Invited) / A. A. Madej ... [et al.] -- pt. VI. Optical frequency combs. Extreme ultraviolet frequency combs for spectroscopy (Invited) / A. Ozawa ... [et al.]. Development of an optical clockwork for the single trapped strontium ion standard at 445 THz / J. E. Bernard ... [et al.]. A phase-coherent link between the visible and infrared spectral ranges using a combination of CW OPO and femtosecond laser frequency comb / E. V. Kovalchuk and A. Peters. Improvements to the robustness of a TI: sapphire-based femtosecond comb at NPL / V. Tsatourian ... [et al.] -- pt. VII. Atomic microwave standards. NIST FI and F2 (Invited) / T. P. Heavner ... [et al.]. Atomic fountains for the USNO master clock (Invited) / C. Ekstrom ... [et al.]. The transportable cesium fountain clock NIM5: its construction and performance (Invited) / T. Li ... [et al.].Compensated multi-pole mercury trapped ion frequency standard and stability evaluation of systematic effects (Invited) / E. A. Burt ... [et al.]. Research of frequency standards in SIOM - atomic frequency standards based on coherent storage (Invited) / B. Yan ... [et al.]. The PTB fountain clock ensemble preliminary characterization of the new fountain CSF2 / N. Nemitz ... [et al.]. The pulsed optically pumped clock: microwave and optical detection / S. Micalizio ... [et al.]. Research on characteristics of pulsed optically pumped rubidium frequency standard / J. Deng ... [et al.]. Status of the continuous cold fountain clocks at METAS-LTF / A. Joyet ... [et al.]. Experiments with a new [symbol]Hg+ ion clock / E. A. Burt ... [et al.]. Optimising a high-stability CW laser-pumped rubidium gas-cell frequency standard / C. Affolderbach ... [et al.]. Raman-Ramsey Cs cell atomic clock / R. Boudot ... [et al.] -- pt. VIII. Microwave resonators & oscillators. Solutions and ultimate limits in temperature compensation of metallic cylindrical microwave resonators (Invited) / A. De Marchi. Cryogenic sapphire oscillators (Invited) / J. G. Hartnett, E. N. Ivanov and M. E. Tobar. Ultra-stable optical cavity: design and experiments / J. Millo ... [et al.]. New results for whispering gallery mode cryogenic sapphire maser oscillators / K. Benmessai ... [et al.] -- pt. IX. Advanced techniques. Fundamental noise-limited optical phase locking at Femtowatt light levels (Invited) / J. Dick ... [et al.]. Microwave and optical frequency transfer via optical fibre / G. Marra ... [et al.]. Ultra-stable laser source for the [symbol]Sr+ single-ion optical frequency standard at NRC / P. Dubé, A. A. Madej and J. E. Bernard. Clock laser system for a strontium lattice clock / T. Legero ... [et al.]. Measurement noise floor for a long-distance optical carrier transmission via fiber / G. Grosche ... [et al.]. Optical frequency transfer over 172 KM of installed fiber / S. Crane -- pt. X. Miniature systems. Chip-scale atomic devices: precision atomic instruments based on MEMS (Invited) / J. Kitching ... [et al.]. CSAC - the chip-scale atomic clock (Invited) / R. Lutwak ... [et al.]. Reaching a few 10[symbol] stability level with a compact cold atom clock / F. X. Esnault ... [et al.]. Evaluation of Lin||Lin CPT for compact and high performance frequency standard / E. Breschi ... [et al.] -- pt. XI. Time scales. Atomic time scales TAI and TI(BIPM): present status and prospects (Invited) / G. Petit. Weight functions for biases in atomic frequency standards / J. H. Shirley -- pt. XII. Interferometers. Definition and construction of noise budget in atom interferometry (Invited) / E. D'Ambriosio. Characterization of a cold atom gyroscope (Invited) / A. Landragin ... [et al.]. A mobile atom interferometer for high precision measurements of local gravity / M. Schmidt ... [et al.]. Demonstration of atom interferometer comprised of geometric beam splitters / Hiromitsu Imai and Atsuo Morinaga -- pt. XIII. New directions. Active optical clocks (Invited) / J. Chen. Prospects for a nuclear optical frequency standard based on Thorium-229 (Invited) / E. Peik ... [et al.]. Whispering gallery mode oscillators and optical comb generators (Invited) / A. B. Matsko ... [et al.]. Frequency comparison using energy-time entangled photons / A. Stefanov -- List of participants.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V; Conley, Raymond; Anderson, Erik H

Verification of the reliability of metrology data from high quality x-ray optics requires that adequate methods for test and calibration of the instruments be developed. For such verification for optical surface profilometers in the spatial frequency domain, a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays has been suggested [Proc. SPIE 7077-7 (2007), Opt. Eng. 47(7), 073602-1-5 (2008)} and proven to be an effective calibration method for a number of interferometric microscopes, a phase shifting Fizeau interferometer, and a scatterometer [Nucl. Instr. and Meth. A 616, 172-82 (2010)]. Here we describe the details ofmore » development of binary pseudo-random multilayer (BPRML) test samples suitable for characterization of scanning (SEM) and transmission (TEM) electron microscopes. We discuss the results of TEM measurements with the BPRML test samples fabricated from a WiSi2/Si multilayer coating with pseudo randomly distributed layers. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize x-ray microscopes. Corresponding work with x-ray microscopes is in progress.« less

Operative EOP activities in VNIIFTRI

NASA Astrophysics Data System (ADS)

Pasynok, S.; Bezmenov, I.; Kaufman, M.

2015-08-01

VNIIFTRI as the Russian Main Metrological Center of Time, Frequencies and Earth Rotation Service carried out the EOP activities for many years. The brief information about these activities is presented.

Overlay accuracy fundamentals

NASA Astrophysics Data System (ADS)

Kandel, Daniel; Levinski, Vladimir; Sapiens, Noam; Cohen, Guy; Amit, Eran; Klein, Dana; Vakshtein, Irina

2012-03-01

Currently, the performance of overlay metrology is evaluated mainly based on random error contributions such as precision and TIS variability. With the expected shrinkage of the overlay metrology budget to < 0.5nm, it becomes crucial to include also systematic error contributions which affect the accuracy of the metrology. Here we discuss fundamental aspects of overlay accuracy and a methodology to improve accuracy significantly. We identify overlay mark imperfections and their interaction with the metrology technology, as the main source of overlay inaccuracy. The most important type of mark imperfection is mark asymmetry. Overlay mark asymmetry leads to a geometrical ambiguity in the definition of overlay, which can be ~1nm or less. It is shown theoretically and in simulations that the metrology may enhance the effect of overlay mark asymmetry significantly and lead to metrology inaccuracy ~10nm, much larger than the geometrical ambiguity. The analysis is carried out for two different overlay metrology technologies: Imaging overlay and DBO (1st order diffraction based overlay). It is demonstrated that the sensitivity of DBO to overlay mark asymmetry is larger than the sensitivity of imaging overlay. Finally, we show that a recently developed measurement quality metric serves as a valuable tool for improving overlay metrology accuracy. Simulation results demonstrate that the accuracy of imaging overlay can be improved significantly by recipe setup optimized using the quality metric. We conclude that imaging overlay metrology, complemented by appropriate use of measurement quality metric, results in optimal overlay accuracy.

DFM flow by using combination between design based metrology system and model based verification at sub-50nm memory device

NASA Astrophysics Data System (ADS)

Kim, Cheol-kyun; Kim, Jungchan; Choi, Jaeseung; Yang, Hyunjo; Yim, Donggyu; Kim, Jinwoong

2007-03-01

As the minimum transistor length is getting smaller, the variation and uniformity of transistor length seriously effect device performance. So, the importance of optical proximity effects correction (OPC) and resolution enhancement technology (RET) cannot be overemphasized. However, OPC process is regarded by some as a necessary evil in device performance. In fact, every group which includes process and design, are interested in whole chip CD variation trend and CD uniformity, which represent real wafer. Recently, design based metrology systems are capable of detecting difference between data base to wafer SEM image. Design based metrology systems are able to extract information of whole chip CD variation. According to the results, OPC abnormality was identified and design feedback items are also disclosed. The other approaches are accomplished on EDA companies, like model based OPC verifications. Model based verification will be done for full chip area by using well-calibrated model. The object of model based verification is the prediction of potential weak point on wafer and fast feed back to OPC and design before reticle fabrication. In order to achieve robust design and sufficient device margin, appropriate combination between design based metrology system and model based verification tools is very important. Therefore, we evaluated design based metrology system and matched model based verification system for optimum combination between two systems. In our study, huge amount of data from wafer results are classified and analyzed by statistical method and classified by OPC feedback and design feedback items. Additionally, novel DFM flow would be proposed by using combination of design based metrology and model based verification tools.

Final report of CCAUV.V-K3: key comparison in the field of acceleration on the complex charge sensitivity

NASA Astrophysics Data System (ADS)

Qiao, Sun; Lifeng, Yang; Bartoli, Claire; Veldman, Ian; Ripper, Gustavo P.; Bruns, Thomas; Rask Licht, Torben; Kolasa, Joanna; Hof, Christian; Silva Pineda, Guillermo; Dickinson, Laurence; Ota, Akihiro; Cheung, Wan Sup; Yankovsky, Alexander; Shan, Cui

2017-01-01

This is the final report for CIPM key comparison CCAUV.V-K3 in the area of 'vibration' (quantity of acceleration). The aim of this comparison was to measure the voltage sensitivity of one accelerometer standard set with primary means at 27 frequencies from 0.1 Hz to 40 Hz. Fourteen Metrology Institutes from five RMOs have participated in the comparison with National Institute of Metrology, P.R. China as pilot lab and Laboratoire National de Métrologie et d'Essais and National Metrology Institute of South Africa as co-pilot labs. One quartz-flexure servo accelerometer of single-ended type and a signal conditioner was circulated among the participants. All but one of the participating laboratories provided their calibration results, which were mostly consistent within their declared expanded uncertainties for magnitude results. Only two participants failed to contribute to the KCRV values calculated for five frequencies. For phase shift, three participants could not contribute to the calculation of the KCRV values in a total of sixteen frequencies. This first low-frequency vibration key comparison revealed the current calibration capabilities of the fourteen participants of five RMOs. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology Camera System Using Two-Color Interferometry

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge; Liebe, Carl Christian; Peters, Robert; Lay, Oliver

2007-01-01

A metrology system that contains no moving parts simultaneously measures the bearings and ranges of multiple reflective targets in its vicinity, enabling determination of the three-dimensional (3D) positions of the targets with submillimeter accuracy. The system combines a direction-measuring metrology camera and an interferometric range-finding subsystem. Because the system is based partly on a prior instrument denoted the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor and because of its 3D capability, the system is denoted the MSTAR3D. Developed for use in measuring the shape (for the purpose of compensating for distortion) of large structures like radar antennas, it can also be used to measure positions of multiple targets in the course of conventional terrestrial surveying. A diagram of the system is shown in the figure. One of the targets is a reference target having a known, constant distance with respect to the system. The system comprises a laser for generating local and target beams at a carrier frequency; a frequency shifting unit to introduce a frequency shift offset between the target and local beams; a pair of high-speed modulators that apply modulation to the carrier frequency in the local and target beams to produce a series of modulation sidebands, the highspeed modulators having modulation frequencies of FL and FM; a target beam launcher that illuminates the targets with the target beam; optics and a multipixel photodetector; a local beam launcher that launches the local beam towards the multi-pixel photodetector; a mirror for projecting to the optics a portion of the target beam reflected from the targets, the optics being configured to focus the portion of the target beam at the multi-pixel photodetector; and a signal-processing unit connected to the photodetector. The portion of the target beam reflected from the targets produces spots on the multi-pixel photodetector corresponding to the targets, respectively, and the signal-processing unit centroids the spots to determine bearings of the targets, respectively. As the spots oscillate in intensity because they are mixed with the local laser beam that is flood illuminating the focal plane, the phase of oscillation of each spot is measured, the phase of sidebands in the oscillation of each spot being proportional to a distance to the corresponding target relative to the reference target A.

Reducing the overlay metrology sensitivity to perturbations of the measurement stack

NASA Astrophysics Data System (ADS)

Zhou, Yue; Park, DeNeil; Gutjahr, Karsten; Gottipati, Abhishek; Vuong, Tam; Bae, Sung Yong; Stokes, Nicholas; Jiang, Aiqin; Hsu, Po Ya; O'Mahony, Mark; Donini, Andrea; Visser, Bart; de Ruiter, Chris; Grzela, Grzegorz; van der Laan, Hans; Jak, Martin; Izikson, Pavel; Morgan, Stephen

2017-03-01

Overlay metrology setup today faces a continuously changing landscape of process steps. During Diffraction Based Overlay (DBO) metrology setup, many different metrology target designs are evaluated in order to cover the full process window. The standard method for overlay metrology setup consists of single-wafer optimization in which the performance of all available metrology targets is evaluated. Without the availability of external reference data or multiwafer measurements it is hard to predict the metrology accuracy and robustness against process variations which naturally occur from wafer-to-wafer and lot-to-lot. In this paper, the capabilities of the Holistic Metrology Qualification (HMQ) setup flow are outlined, in particular with respect to overlay metrology accuracy and process robustness. The significance of robustness and its impact on overlay measurements is discussed using multiple examples. Measurement differences caused by slight stack variations across the target area, called grating imbalance, are shown to cause significant errors in the overlay calculation in case the recipe and target have not been selected properly. To this point, an overlay sensitivity check on perturbations of the measurement stack is presented for improvement of the overlay metrology setup flow. An extensive analysis on Key Performance Indicators (KPIs) from HMQ recipe optimization is performed on µDBO measurements of product wafers. The key parameters describing the sensitivity to perturbations of the measurement stack are based on an intra-target analysis. Using advanced image analysis, which is only possible for image plane detection of μDBO instead of pupil plane detection of DBO, the process robustness performance of a recipe can be determined. Intra-target analysis can be applied for a wide range of applications, independent of layers and devices.

Industrial graphene metrology.

PubMed

Kyle, Jennifer Reiber; Ozkan, Cengiz S; Ozkan, Mihrimah

2012-07-07

Graphene is an allotrope of carbon whose structure is based on one-atom-thick planar sheets of carbon atoms that are densely packed in a honeycomb crystal lattice. Its unique electrical and optical properties raised worldwide interest towards the design and fabrication of future electronic and optical devices with unmatched performance. At the moment, extensive efforts are underway to evaluate the reliability and performance of a number of such devices. With the recent advances in synthesizing large-area graphene sheets, engineers have begun investigating viable methodologies for conducting graphene metrology and quality control at industrial scales to understand a variety of reliability issues including defects, patternability, electrical, and physical properties. This review summarizes the current state of industrial graphene metrology and provides an overview of graphene metrology techniques. In addition, a recently developed large-area graphene metrology technique based on fluorescence quenching is introduced. For each metrology technique, the industrial metrics it measures are identified--layer thickness, edge structure, defects, Fermi level, and thermal conductivity--and a detailed description is provided as to how the measurements are performed. Additionally, the potential advantages of each technique for industrial use are identified, including throughput, scalability, sensitivity to substrate/environment, and on their demonstrated ability to achieve quantified results. The recently developed fluorescence-quenching metrology technique is shown to meet all the necessary criteria for industrial applications, rendering it the first industry-ready graphene metrology technique.

A 920-kilometer optical fiber link for frequency metrology at the 19th decimal place.

PubMed

Predehl, K; Grosche, G; Raupach, S M F; Droste, S; Terra, O; Alnis, J; Legero, Th; Hänsch, T W; Udem, Th; Holzwarth, R; Schnatz, H

2012-04-27

Optical clocks show unprecedented accuracy, surpassing that of previously available clock systems by more than one order of magnitude. Precise intercomparisons will enable a variety of experiments, including tests of fundamental quantum physics and cosmology and applications in geodesy and navigation. Well-established, satellite-based techniques for microwave dissemination are not adequate to compare optical clocks. Here, we present phase-stabilized distribution of an optical frequency over 920 kilometers of telecommunication fiber. We used two antiparallel fiber links to determine their fractional frequency instability (modified Allan deviation) to 5 × 10(-15) in a 1-second integration time, reaching 10(-18) in less than 1000 seconds. For long integration times τ, the deviation from the expected frequency value has been constrained to within 4 × 10(-19). The link may serve as part of a Europe-wide optical frequency dissemination network.

Performance of a laser frequency comb calibration system with a high-resolution solar echelle spectrograph

NASA Astrophysics Data System (ADS)

Doerr, H.-P.; Kentischer, T. J.; Steinmetz, T.; Probst, R. A.; Franz, M.; Holzwarth, R.; Udem, Th.; Hänsch, T. W.; Schmidt, W.

2012-09-01

Laser frequency combs (LFC) provide a direct link between the radio frequency (RF) and the optical frequency regime. The comb-like spectrum of an LFC is formed by exact equidistant laser modes, whose absolute optical frequencies are controlled by RF-references such as atomic clocks or GPS receivers. While nowadays LFCs are routinely used in metrological and spectroscopic fields, their application in astronomy was delayed until recently when systems became available with a mode spacing and wavelength coverage suitable for calibration of astronomical spectrographs. We developed a LFC based calibration system for the high-resolution echelle spectrograph at the German Vacuum Tower Telescope (VTT), located at the Teide observatory, Tenerife, Canary Islands. To characterize the calibration performance of the instrument, we use an all-fiber setup where sunlight and calibration light are fed to the spectrograph by the same single-mode fiber, eliminating systematic effects related to variable grating illumination.

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

NASA Astrophysics Data System (ADS)

Smilde, Henk-Jan H.; den Boef, Arie; Kubis, Michael; Jak, Martin; van Schijndel, Mark; Fuchs, Andreas; van der Schaar, Maurits; Meyer, Steffen; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Wang, Cathy; Bhattacharyya, Kaustuve; Chen, Kai-Hsiung; Huang, Guo-Tsai; Ke, Chih-Ming; Huang, Jacky

2012-03-01

Reducing the size of metrology targets is essential for in-die overlay metrology in advanced semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) measurements with a YieldStar metrology tool are presented for target-sizes down to 10 × 10 μm2. The μDBO technology enables selection of only the diffraction efficiency information from the grating by efficiently separating it from product structure reflections. Therefore, μDBO targets -even when located adjacent to product environment- give excellent correlation with 40 × 160 μm2 reference targets. Although significantly smaller than standard scribe-line targets, they can achieve total-measurement-uncertainty values of below 0.5 nm on a wide range of product layers. This shows that the new μDBO technique allows for accurate metrology on ultra small in-die targets, while retaining the excellent TMU performance of diffraction-based overlay metrology.

Single-ion, transportable optical atomic clocks

NASA Astrophysics Data System (ADS)

Delehaye, Marion; Lacroûte, Clément

2018-03-01

For the past 15 years, tremendous progress within the fields of laser stabilization, optical frequency combs and atom cooling and trapping have allowed the realization of optical atomic clocks with unrivaled performances. These instruments can perform frequency comparisons with fractional uncertainties well below ?, finding applications in fundamental physics tests, relativistic geodesy and time and frequency metrology. Even though most optical clocks are currently laboratory setups, several proposals for using these clocks for field measurements or within an optical clock network have been published, and most of time and frequency metrology institutes have started to develop transportable optical clocks. For the purpose of this special issue, we chose to focus on trapped-ion optical clocks. Even though their short-term fractional frequency stability is impaired by a lower signal-to-noise ratio, they offer a high potential for compactness: trapped ions demand low optical powers and simple loading schemes, and can be trapped in small vacuum chambers. We review recent advances on the clock key components, including ion trap and ultra-stable optical cavity, as well as existing projects and experiments which draw the picture of what future transportable, single-ion optical clocks may resemble.

Optical Frequency Synthesizer for Precision Spectroscopy

NASA Astrophysics Data System (ADS)

Holzwarth, R.; Udem, Th.; Hänsch, T. W.; Knight, J. C.; Wadsworth, W. J.; Russell, P. St. J.

2000-09-01

We have used the frequency comb generated by a femtosecond mode-locked laser and broadened to more than an optical octave in a photonic crystal fiber to realize a frequency chain that links a 10 MHz radio frequency reference phase-coherently in one step to the optical region. By comparison with a similar frequency chain we set an upper limit for the uncertainty of this new approach to 5.1×10-16. This opens the door for measurement and synthesis of virtually any optical frequency and is ready to revolutionize frequency metrology.

Metrological features of the rubidium two-photon standards of the BNM-LPTF and Kastler Brossel Laboratories

NASA Astrophysics Data System (ADS)

Hilico, L.; Felder, R.; Touahri, D.; Acef, O.; Clairon, A.; Biraben, F.

1998-11-01

We have built three optical frequency standards based on the two-photon transition of rubidium at 778nm, and analysed their performance over a period of more than three years. We discuss some systematic effects that could lead to the reproducibility we observe, and point out the possible improvements of the devices. We also examine the short and long term stabilities of the systems, and show that we have reached their ultimate performances.

Absolute metrology for space interferometers

NASA Astrophysics Data System (ADS)

Salvadé, Yves; Courteville, Alain; Dändliker, René

2017-11-01

The crucial issue of space-based interferometers is the laser interferometric metrology systems to monitor with very high accuracy optical path differences. Although classical high-resolution laser interferometers using a single wavelength are well developed, this type of incremental interferometer has a severe drawback: any interruption of the interferometer signal results in the loss of the zero reference, which requires a new calibration, starting at zero optical path difference. We propose in this paper an absolute metrology system based on multiplewavelength interferometry.

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Maas, D. J., E-mail: diederik.maas@tno.nl; Herfst, R.; Veldhoven, E. van

2015-10-15

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate samplemore » charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.« less

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

NASA Astrophysics Data System (ADS)

Maas, D. J.; Fliervoet, T.; Herfst, R.; van Veldhoven, E.; Meessen, J.; Vaenkatesan, V.; Sadeghian, H.

2015-10-01

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate sample charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.

Improving OCD time to solution using Signal Response Metrology

NASA Astrophysics Data System (ADS)

Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

2016-03-01

In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

Evaluation of the Time and Frequency Transfer Capabilities of a Network of GNSS Receivers Located in Timing Laboratories

DTIC Science & Technology

2009-11-01

metrology, different techniques are used for time and frequency transfer, basically TWSTFT (Two-Way Satellite Time and Frequency Transfer), GPS CV (Common...traditional GPS/GLONASS CV/AV receivers and TWSTFT equipment. Time and frequency transfer using GPS code and carrier-phase is an important...or mixing GPS geodetic results with other independent techniques, such as the TWSTFT . 41 st Annual Precise Time and Time Interval (PTTI

Near- and Far-Field Characterization of Planar mm-Wave Antenna Arrays with Waveguide-to-Microstrip Transition

NASA Astrophysics Data System (ADS)

Salhi, Mohammed Adnan; Kazemipour, Alireza; Gentille, Gennaro; Spirito, Marco; Kleine-Ostmann, Thomas; Schrader, Thorsten

2016-09-01

We present the design and characterization of planar mm-wave patch antenna arrays with waveguide-to-microstrip transition using both near- and far-field methods. The arrays were designed for metrological assessment of error sources in antenna measurement. One antenna was designed for the automotive radar frequency range at 77 GHz, while another was designed for the frequency of 94 GHz, which is used, e.g., for imaging radar applications. In addition to the antennas, a simple transition from rectangular waveguide WR-10 to planar microstrip line on Rogers 3003™ substrate has been designed based on probe coupling. For determination of the far-field radiation pattern of the antennas, we compare results from two different measurement methods to simulations. Both a far-field antenna measurement system and a planar near-field scanner with near-to-far-field transformation were used to determine the antenna diagrams. The fabricated antennas achieve a good matching and a good agreement between measured and simulated antenna diagrams. The results also show that the far-field scanner achieves more accurate measurement results with regard to simulations than the near-field scanner. The far-field antenna scanning system is built for metrological assessment and antenna calibration. The antennas are the first which were designed to be tested with the measurement system.

Binary pseudo-random patterned structures for modulation transfer function calibration and resolution characterization of a full-field transmission soft x-ray microscope

DOE PAGES

Yashchuk, V. V.; Fischer, P. J.; Chan, E. R.; ...

2015-12-09

We present a modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) one-dimensional sequences and two-dimensional arrays as an effective method for spectral characterization in the spatial frequency domain of a broad variety of metrology instrumentation, including interferometric microscopes, scatterometers, phase shifting Fizeau interferometers, scanning and transmission electron microscopes, and at this time, x-ray microscopes. The inherent power spectral density of BPR gratings and arrays, which has a deterministic white-noise-like character, allows a direct determination of the MTF with a uniform sensitivity over the entire spatial frequency range and field of view of an instrument. We demonstrate themore » MTF calibration and resolution characterization over the full field of a transmission soft x-ray microscope using a BPR multilayer (ML) test sample with 2.8 nm fundamental layer thickness. We show that beyond providing a direct measurement of the microscope's MTF, tests with the BPRML sample can be used to fine tune the instrument's focal distance. Finally, our results confirm the universality of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.« less

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk

2016-05-15

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicabilitymore » in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.« less

Radioactive waste management: review on clearance levels and acceptance criteria legislation, requirements and standards.

PubMed

Maringer, F J; Suráň, J; Kovář, P; Chauvenet, B; Peyres, V; García-Toraño, E; Cozzella, M L; De Felice, P; Vodenik, B; Hult, M; Rosengård, U; Merimaa, M; Szücs, L; Jeffery, C; Dean, J C J; Tymiński, Z; Arnold, D; Hinca, R; Mirescu, G

2013-11-01

In 2011 the joint research project Metrology for Radioactive Waste Management (MetroRWM)(1) of the European Metrology Research Programme (EMRP) started with a total duration of three years. Within this project, new metrological resources for the assessment of radioactive waste, including their calibration with new reference materials traceable to national standards will be developed. This paper gives a review on national, European and international strategies as basis for science-based metrological requirements in clearance and acceptance of radioactive waste. © 2013 Elsevier Ltd. All rights reserved.

Integration of mask and silicon metrology in DFM

NASA Astrophysics Data System (ADS)

Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

2009-03-01

We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based on the profiling method of the field proven CD metrology algorithm. The detected edges are then converted to GDSII format, which is a standard format for a design data, and utilized for various DFM systems such as simulation. Namely, by integrating pattern shapes of mask and silicon formed during a manufacturing process into GDSII format, it makes it possible to bridge highly accurate pattern profile information over to the design field of various EDA systems. These are fully integrated into design data and automated. Bi-directional cross probing between mask data and process control data is allowed by linking them. This method is a solution for total optimization that covers Design, MDP, mask production and silicon device producing. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)

NASA Astrophysics Data System (ADS)

Wallow, Thomas I.; Zhang, Chen; Fumar-Pici, Anita; Chen, Jun; Laenens, Bart; Spence, Christopher A.; Rio, David; van Adrichem, Paul; Dillen, Harm; Wang, Jing; Yang, Peng-Cheng; Gillijns, Werner; Jaenen, Patrick; van Roey, Frieda; van de Kerkhove, Jeroen; Babin, Sergey

2017-03-01

In the course of assessing OPC compact modeling capabilities and future requirements, we chose to investigate the interface between CD-SEM metrology methods and OPC modeling in some detail. Two linked observations motivated our study: 1) OPC modeling is, in principle, agnostic of metrology methods and best practice implementation. 2) Metrology teams across the industry use a wide variety of equipment, hardware settings, and image/data analysis methods to generate the large volumes of CD-SEM measurement data that are required for OPC in advanced technology nodes. Initial analyses led to the conclusion that many independent best practice metrology choices based on systematic study as well as accumulated institutional knowledge and experience can be reasonably made. Furthermore, these choices can result in substantial variations in measurement of otherwise identical model calibration and verification patterns. We will describe several experimental 2D test cases (i.e., metal, via/cut layers) that examine how systematic changes in metrology practice impact both the metrology data itself and the resulting full chip compact model behavior. Assessment of specific methodology choices will include: • CD-SEM hardware configurations and settings: these may range from SEM beam conditions (voltage, current, etc.,) to magnification, to frame integration optimizations that balance signal-to-noise vs. resist damage. • Image and measurement optimization: these may include choice of smoothing filters for noise suppression, threshold settings, etc. • Pattern measurement methodologies: these may include sampling strategies, CD- and contour- based approaches, and various strategies to optimize the measurement of complex 2D shapes. In addition, we will present conceptual frameworks and experimental methods that allow practitioners of OPC metrology to assess impacts of metrology best practice choices on model behavior. Finally, we will also assess requirements posed by node scaling on OPC model accuracy, and evaluate potential consequences for CD-SEM metrology capabilities and practices.

Metrological Support in Technosphere Safety

NASA Astrophysics Data System (ADS)

Akhobadze, G. N.

2017-11-01

The principle of metrological support in technosphere safety is considered. It is based on the practical metrology. The theoretical aspects of accuracy and errors of the measuring instruments intended for diagnostics and control of the technosphere under the influence of factors harmful to human beings are presented. The necessity to choose measuring devices with high metrological characteristics according to the accuracy class and contact of sensitive elements with a medium under control is shown. The types of additional errors in measuring instruments that arise when they are affected by environmental influences are described. A specific example of the analyzers application to control industrial emissions and measure the oil and particulate matter in wastewater is shown; it allows assessing advantages and disadvantages of analyzers. Besides, the recommendations regarding the missing metrological characteristics of the instruments in use are provided. The technosphere continuous monitoring taking into account the metrological principles is expected to efficiently forecast the technosphere development and make appropriate decisions.

Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

NASA Astrophysics Data System (ADS)

Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

2017-09-01

For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

Study of Frequency Transfer via Optical Fiber in the Microwave Domain

DTIC Science & Technology

2009-11-01

DOMAIN M. Amemiya, M. Imae, Y. Fujii, T. Suzuyama, K. Watabe, T. Ikegami , and H. Tsuchida* National Metrology Institute of Japan (NMIJ...Yanagimachi, A. Takamizawa, K. Watabe, T. Ikegami , M. Imae, Y. Fujii, M. Amemiya, K. Nakagawa, K. Ueda, and H. Katori, 2009, “Measuring the frequency of a...Shimazaki, T. Ikegami and S. Ohshima, 2006, “Short term frequency stability tests of two cryogenic sapphire oscillators,” Japanese Journal of

Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time

NASA Astrophysics Data System (ADS)

Zhao, Qian; Wang, Lei; Wang, Jazer; Wang, ChangAn; Shi, Hong-Fei; Guerrero, James; Feng, Mu; Zhang, Qiang; Liang, Jiao; Guo, Yunbo; Zhang, Chen; Wallow, Tom; Rio, David; Wang, Lester; Wang, Alvin; Wang, Jen-Shiang; Gronlund, Keith; Lang, Jun; Koh, Kar Kit; Zhang, Dong Qing; Zhang, Hongxin; Krishnamurthy, Subramanian; Fei, Ray; Lin, Chiawen; Fang, Wei; Wang, Fei

2018-03-01

Classical SEM metrology, CD-SEM, uses low data rate and extensive frame-averaging technique to achieve high-quality SEM imaging for high-precision metrology. The drawbacks include prolonged data collection time and larger photoresist shrinkage due to excess electron dosage. This paper will introduce a novel e-beam metrology system based on a high data rate, large probe current, and ultra-low noise electron optics design. At the same level of metrology precision, this high speed e-beam metrology system could significantly shorten data collection time and reduce electron dosage. In this work, the data collection speed is higher than 7,000 images per hr. Moreover, a novel large field of view (LFOV) capability at high resolution was enabled by an advanced electron deflection system design. The area coverage by LFOV is >100x larger than classical SEM. Superior metrology precision throughout the whole image has been achieved, and high quality metrology data could be extracted from full field. This new capability on metrology will further improve metrology data collection speed to support the need for large volume of metrology data from OPC model calibration of next generation technology. The shrinking EPE (Edge Placement Error) budget places more stringent requirement on OPC model accuracy, which is increasingly limited by metrology errors. In the current practice of metrology data collection and data processing to model calibration flow, CD-SEM throughput becomes a bottleneck that limits the amount of metrology measurements available for OPC model calibration, impacting pattern coverage and model accuracy especially for 2D pattern prediction. To address the trade-off in metrology sampling and model accuracy constrained by the cycle time requirement, this paper employs the high speed e-beam metrology system and a new computational software solution to take full advantage of the large volume data and significantly reduce both systematic and random metrology errors. The new computational software enables users to generate large quantity of highly accurate EP (Edge Placement) gauges and significantly improve design pattern coverage with up to 5X gain in model prediction accuracy on complex 2D patterns. Overall, this work showed >2x improvement in OPC model accuracy at a faster model turn-around time.

Ultrastable laser array at 633 nm for real-time dimensional metrology

NASA Astrophysics Data System (ADS)

Lawall, John; Pedulla, J. Marc; Le Coq, Yann

2001-07-01

We describe a laser system for very-high-accuracy dimensional metrology. A sealed-cavity helium-neon laser is offset locked to an iodine-stabilized laser in order to realize a secondary standard with higher power and less phase noise. Synchronous averaging is employed to remove the effect of the frequency modulation present on the iodine-stabilized laser. Additional lasers are offset locked to the secondary standard for use in interferometry. All servo loops are implemented digitally. The offset-locked lasers have intrinsic linewidths of the order of 2.5 kHz and exhibit a rms deviation from the iodine-stabilized laser below 18 kHz. The amplitude noise is at the shot-noise limit for frequencies above 700 kHz. We describe and evaluate the system in detail, and include a discussion of the noise associated with various types of power supplies.

Integrating Residual Stress Analysis of Critical Fastener Holes into USAF Depot Maintenance

DTIC Science & Technology

2014-11-02

40 Table 15. Metrology of the initial reamer, initial hole diameters, and resulting CX for the class/type hole combinations for Pattern 1...70 Table 16. Metrology of the initial reamer, initial hole diameters, and resulting...step in the cold work process. These procedures produce a digital documentation of the hole, based on critical metrology , which can be linked with

Testing of Anesthesia Machines and Defibrillators in Healthcare Institutions.

PubMed

Gurbeta, Lejla; Dzemic, Zijad; Bego, Tamer; Sejdic, Ervin; Badnjevic, Almir

2017-09-01

To improve the quality of patient treatment by improving the functionality of medical devices in healthcare institutions. To present the results of the safety and performance inspection of patient-relevant output parameters of anesthesia machines and defibrillators defined by legal metrology. This study covered 130 anesthesia machines and 161 defibrillators used in public and private healthcare institutions, during a period of two years. Testing procedures were carried out according to international standards and legal metrology legislative procedures in Bosnia and Herzegovina. The results show that in 13.84% of tested anesthesia machine and 14.91% of defibrillators device performance is not in accordance with requirements and should either have its results be verified, or the device removed from use or scheduled for corrective maintenance. Research emphasizes importance of independent safety and performance inspections, and gives recommendations for the frequency of inspection based on measurements. Results offer implications for adequacy of preventive and corrective maintenance performed in healthcare institutions. Based on collected data, the first digital electronical database of anesthesia machines and defibrillators used in healthcare institutions in Bosnia and Herzegovina is created. This database is a useful tool for tracking each device's performance over time.

Performance of a GaAlAs laser diode stabilized on a hyperfine component of two-photon transitions in rubidium at 778 nm

NASA Astrophysics Data System (ADS)

Felder, Raymond; Touahri, D.; Acef, Ouali; Hilico, L.; Zondy, Jean-Jacques; Clairon, Andre; de Beauvoir, Beatrice; Biraben, Francois; Julien, Lucile; Nez, Francois; Millerioux, Yves P.

1995-04-01

The absolute frequency measurement of each hyperfine component of the 5S3/2 and 5S5/2 levels in rubidium was done at ENS more than one year ago using Ti-Sa lasers. We built two devices based on diode lasers to study some metrological properties. We measure the frequency differences between hyperfine components of the 5S5/2 level and we calculate the corresponding hyperfine constants. We also measure the frequency interval between the 5S3/2 and 5S5/2 levels using a Schottky diode. The measured stability in terms of Allan variance is 3*10-13t-1/2 up to 2000 s. The light shift is investigated and the difference between our two systems is 1.7 kHz. The repeatability of one system is better than 10-12 and will allow the absolute frequency measurement at this level via the LPTF frequency synthesis chain.

Adjustment method for embedded metrology engine in an EM773 series microcontroller.

PubMed

Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

2015-09-01

This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

Component-Level Demonstration of a Microfabricated Atomic Frequency Reference

DTIC Science & Technology

2005-08-01

Kitching, L. A. Liew, and J. Moreland, "A microfabricated atomic clock," Applied Physics Letters, vol. 85, pp. 1460-1462, 2004. [4] R. Lutwak , P...Symposium on Frequency Standards and Metrology, P. Gill, Ed. St. Andrews, Scotland: World Scientific, 2001, pp. 155-166. [31] R. Lutwak , D. Emmons...Frequency and Time Forum. Tampa, FL, 2003, pp. 31-32. [71] R. Lutwak , D. Emmons, T. English, W. Riley, A. Duwel, M. Varghese, D. K. Serkland, and

Implementation and performance of the metrology system for the multi-object optical and near-infrared spectrograph MOONS

NASA Astrophysics Data System (ADS)

Drass, Holger; Vanzi, Leonardo; Torres-Torriti, Miguel; Dünner, Rolando; Shen, Tzu-Chiang; Belmar, Francisco; Dauvin, Lousie; Staig, Tomás.; Antognini, Jonathan; Flores, Mauricio; Luco, Yerko; Béchet, Clémentine; Boettger, David; Beard, Steven; Montgomery, David; Watson, Stephen; Cabral, Alexandre; Hayati, Mahmoud; Abreu, Manuel; Rees, Phil; Cirasuolo, Michele; Taylor, William; Fairley, Alasdair

2016-08-01

The Multi-Object Optical and Near-infrared Spectrograph (MOONS) will cover the Very Large Telescope's (VLT) field of view with 1000 fibres. The fibres will be mounted on fibre positioning units (FPU) implemented as two-DOF robot arms to ensure a homogeneous coverage of the 500 square arcmin field of view. To accurately and fast determine the position of the 1000 fibres a metrology system has been designed. This paper presents the hardware and software design and performance of the metrology system. The metrology system is based on the analysis of images taken by a circular array of 12 cameras located close to the VLTs derotator ring around the Nasmyth focus. The system includes 24 individually adjustable lamps. The fibre positions are measured through dedicated metrology targets mounted on top of the FPUs and fiducial markers connected to the FPU support plate which are imaged at the same time. A flexible pipeline based on VLT standards is used to process the images. The position accuracy was determined to 5 μm in the central region of the images. Including the outer regions the overall positioning accuracy is 25 μm. The MOONS metrology system is fully set up with a working prototype. The results in parts of the images are already excellent. By using upcoming hardware and improving the calibration it is expected to fulfil the accuracy requirement over the complete field of view for all metrology cameras.

Optimal design of tilt carrier frequency computer-generated holograms to measure aspherics.

PubMed

Peng, Jiantao; Chen, Zhe; Zhang, Xingxiang; Fu, Tianjiao; Ren, Jianyue

2015-08-20

Computer-generated holograms (CGHs) provide an approach to high-precision metrology of aspherics. A CGH is designed under the trade-off among size, mapping distortion, and line spacing. This paper describes an optimal design method based on the parametric model for tilt carrier frequency CGHs placed outside the interferometer focus points. Under the condition of retaining an admissible size and a tolerable mapping distortion, the optimal design method has two advantages: (1) separating the parasitic diffraction orders to improve the contrast of the interferograms and (2) achieving the largest line spacing to minimize sensitivity to fabrication errors. This optimal design method is applicable to common concave aspherical surfaces and illustrated with CGH design examples.

Manipulation of individual hyperfine states in cold trapped molecular ions and application to HD+ frequency metrology.

PubMed

Bressel, U; Borodin, A; Shen, J; Hansen, M; Ernsting, I; Schiller, S

2012-05-04

Advanced techniques for manipulation of internal states, standard in atomic physics, are demonstrated for a charged molecular species for the first time. We address individual hyperfine states of rovibrational levels of a diatomic ion by optical excitation of individual hyperfine transitions, and achieve controlled transfer of population into a selected hyperfine state. We use molecular hydrogen ions (HD+) as a model system and employ a novel frequency-comb-based, continuous-wave 5  μm laser spectrometer. The achieved spectral resolution is the highest obtained so far in the optical domain on a molecular ion species. As a consequence, we are also able to perform the most precise test yet of the ab initio theory of a molecule.

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory.

PubMed

Soufli, Regina; Baker, Sherry L; Windt, David L; Gullikson, Eric M; Robinson, Jeff C; Podgorski, William A; Golub, Leon

2007-06-01

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV) wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement with EUV reflectance measurements of the mirrors after multilayer coating.

Thermoelectric converters for alternating current standards

NASA Astrophysics Data System (ADS)

Anatychuk, L. I.; Taschuk, D. D.

2012-06-01

Thermoelectric converters of alternating current remain priority instruments when creating standard equipment. This work presents the results of design and manufacture of alternating current converter for a military standard of alternating current in Ukraine. Results of simulation of temperature distribution in converter elements, ways of optimization to improve the accuracy of alternating current signal reproduction are presented. Results of metrological trials are given. The quality of thermoelectric material specially created for alternating current metrology is verified. The converter was used in alternating current standard for the frequency range from 10 Hz to 30 MHz. The efficiency of using thermoelectric signal converters in measuring instruments is confirmed.

DLP-based 3D metrology by structured light or projected fringe technology for life sciences and industrial metrology

NASA Astrophysics Data System (ADS)

Frankowski, G.; Hainich, R.

2009-02-01

Since the mid-eighties, a fundamental idea for achieving measuring accuracy in projected fringe technology was to consider the projected fringe pattern as an interferogram and evaluate it on the basis of advanced algorithms widely used for phase measuring in real-time interferometry. A fundamental requirement for obtaining a sufficiently high degree of measuring accuracy with this so-called "phase measuring projected fringe technology" is that the projected fringes, analogous to interference fringes, must have a cos2-shaped intensity distribution. Until the mid-nineties, this requirement for the projected fringe pattern measurement technology presented a basic handicap for its wide application in 3D metrology. This situation changed abruptly, when in the nineties Texas Instruments introduced to the market advanced digital light projection on the basis of micro mirror based projection systems, socalled DLP technology, which also facilitated the generation and projection of cos2-shaped intensity and/or fringe patterns. With this DLP technology, which from its original approach was actually oriented towards completely different applications such as multimedia projection, Texas Instruments boosted phase-measuring fringe projection in optical 3D metrology to a worldwide breakthrough both for medical as well as industrial applications. A subject matter of the lecture will be to present the fundamental principles and the resulting advantages of optical 3D metrology based on phase-measuring fringe projection using DLP technology. Further will be presented and discussed applications of the measurement technology in medical engineering and industrial metrology.

Metrology for the manufacturing of freeform optics

NASA Astrophysics Data System (ADS)

Blalock, Todd; Myer, Brian; Ferralli, Ian; Brunelle, Matt; Lynch, Tim

2017-10-01

Recently the use of freeform surfaces have become a realization for optical designers. These non-symmetrical optical surfaces have allowed unique solutions to optical design problems. The implementation of freeform optical surfaces has been limited by manufacturing capabilities and quality. However over the past several years freeform fabrication processes have improved in capability and precision. But as with any manufacturing, proper metrology is required to monitor and verify the process. Typical optics metrology such as interferometry has its challenges and limitations with the unique shapes of freeform optics. Two contact metrology methods for freeform metrology are presented; a Leitz coordinate measurement machine (CMM) with an uncertainty of +/- 0.5 μm and a high resolution profilometer (Panasonic UA3P) with a measurement uncertainty of +/- 0.05 μm. We are also developing a non-contact high resolution technique based on the fringe reflection technique known as deflectometry. This fast non-contact metrology has the potential to compete with accuracies of the contact methods but also can acquire data in seconds rather than minutes or hours.

Multi-object investigation using two-wavelength phase-shift interferometry guided by an optical frequency comb

NASA Astrophysics Data System (ADS)

Ibrahim, Dahi Ghareab Abdelsalam; Yasui, Takeshi

2018-04-01

Two-wavelength phase-shift interferometry guided by optical frequency combs is presented. We demonstrate the operation of the setup with a large step sample simultaneously with a resolution test target with a negative pattern. The technique can investigate multi-objects simultaneously with high precision. Using this technique, several important applications in metrology that require high speed and precision are demonstrated.

Frequency characterization of a swept- and fixed-wavelength external-cavity quantum cascade laser by use of a frequency comb.

PubMed

Knabe, Kevin; Williams, Paul A; Giorgetta, Fabrizio R; Armacost, Chris M; Crivello, Sam; Radunsky, Michael B; Newbury, Nathan R

2012-05-21

The instantaneous optical frequency of an external-cavity quantum cascade laser (QCL) is characterized by comparison to a near-infrared frequency comb. Fluctuations in the instantaneous optical frequency are analyzed to determine the frequency-noise power spectral density for the external-cavity QCL both during fixed-wavelength and swept-wavelength operation. The noise performance of a near-infrared external-cavity diode laser is measured for comparison. In addition to providing basic frequency metrology of external-cavity QCLs, this comb-calibrated swept QCL system can be applied to rapid, precise broadband spectroscopy in the mid-infrared spectral region.

IT Security Standards and Legal Metrology - Transfer and Validation

NASA Astrophysics Data System (ADS)

Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

2014-08-01

Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

Efficient tools for quantum metrology with uncorrelated noise

NASA Astrophysics Data System (ADS)

Kołodyński, Jan; Demkowicz-Dobrzański, Rafał

2013-07-01

Quantum metrology offers enhanced performance in experiments on topics such as gravitational wave-detection, magnetometry or atomic clock frequency calibration. The enhancement, however, requires a delicate tuning of relevant quantum features, such as entanglement or squeezing. For any practical application, the inevitable impact of decoherence needs to be taken into account in order to correctly quantify the ultimate attainable gain in precision. We compare the applicability and the effectiveness of various methods of calculating the ultimate precision bounds resulting from the presence of decoherence. This allows us to place a number of seemingly unrelated concepts into a common framework and arrive at an explicit hierarchy of quantum metrological methods in terms of the tightness of the bounds they provide. In particular, we show a way to extend the techniques originally proposed in Demkowicz-Dobrzański et al (2012 Nature Commun. 3 1063), so that they can be efficiently applied not only in the asymptotic but also in the finite number of particles regime. As a result, we obtain a simple and direct method, yielding bounds that interpolate between the quantum enhanced scaling characteristic for a small number of particles and the asymptotic regime, where quantum enhancement amounts to a constant factor improvement. Methods are applied to numerous models, including noisy phase and frequency estimation, as well as the estimation of the decoherence strength itself.

Metrology Optical Power Budgeting in SIM Using Statistical Analysis Techniques

NASA Technical Reports Server (NTRS)

Kuan, Gary M

2008-01-01

The Space Interferometry Mission (SIM) is a space-based stellar interferometry instrument, consisting of up to three interferometers, which will be capable of micro-arc second resolution. Alignment knowledge of the three interferometer baselines requires a three-dimensional, 14-leg truss with each leg being monitored by an external metrology gauge. In addition, each of the three interferometers requires an internal metrology gauge to monitor the optical path length differences between the two sides. Both external and internal metrology gauges are interferometry based, operating at a wavelength of 1319 nanometers. Each gauge has fiber inputs delivering measurement and local oscillator (LO) power, split into probe-LO and reference-LO beam pairs. These beams experience power loss due to a variety of mechanisms including, but not restricted to, design efficiency, material attenuation, element misalignment, diffraction, and coupling efficiency. Since the attenuation due to these sources may degrade over time, an accounting of the range of expected attenuation is needed so an optical power margin can be book kept. A method of statistical optical power analysis and budgeting, based on a technique developed for deep space RF telecommunications, is described in this paper and provides a numerical confidence level for having sufficient optical power relative to mission metrology performance requirements.

Toward Advancing Nano-Object Count Metrology: A Best Practice Framework

PubMed Central

Boyko, Volodymyr; Meyers, Greg; Voetz, Matthias; Wohlleben, Wendel

2013-01-01

Background: A movement among international agencies and policy makers to classify industrial materials by their number content of sub–100-nm particles could have broad implications for the development of sustainable nanotechnologies. Objectives: Here we highlight current particle size metrology challenges faced by the chemical industry due to these emerging number percent content thresholds, provide a suggested best-practice framework for nano-object identification, and identify research needs as a path forward. Discussion: Harmonized methods for identifying nanomaterials by size and count for many real-world samples do not currently exist. Although particle size remains the sole discriminating factor for classifying a material as “nano,” inconsistencies in size metrology will continue to confound policy and decision making. Moreover, there are concerns that the casting of a wide net with still-unproven metrology methods may stifle the development and judicious implementation of sustainable nanotechnologies. Based on the current state of the art, we propose a tiered approach for evaluating materials. To enable future risk-based refinements of these emerging definitions, we recommend that this framework also be considered in environmental and human health research involving the implications of nanomaterials. Conclusion: Substantial scientific scrutiny is needed in the area of nanomaterial metrology to establish best practices and to develop suitable methods before implementing definitions based solely on number percent nano-object content for regulatory purposes. Strong cooperation between industry, academia, and research institutions will be required to fully develop and implement detailed frameworks for nanomaterial identification with respect to emerging count-based metrics. Citation: Brown SC, Boyko V, Meyers G, Voetz M, Wohlleben W. 2013. Toward advancing nano-object count metrology: a best practice framework. Environ Health Perspect 121:1282–1291; http://dx.doi.org/10.1289/ehp.1306957 PMID:24076973

NASA Tech Briefs, January 2009

NASA Technical Reports Server (NTRS)

2009-01-01

Tech Briefs are short announcements of innovations originating from research and development activities of the National Aeronautics and Space Administration. They emphasize information considered likely to be transferable across industrial, regional, or disciplinary lines and are issued to encourage commercial application. Topics covered include: The Radio Frequency Health Node Wireless Sensor System; Effects of Temperature on Polymer/Carbon Chemical Sensors; Small CO2 Sensors Operate at Lower Temperature; Tele-Supervised Adaptive Ocean Sensor Fleet; Synthesis of Submillimeter Radiation for Spectroscopy; 100-GHz Phase Switch/Mixer Containing a Slot-Line Transition; Generating Ka-Band Signals Using an X-Band Vector Modulator; SiC Optically Modulated Field-Effect Transistor; Submillimeter-Wave Amplifier Module with Integrated Waveguide Transitions; Metrology System for a Large, Somewhat Flexible Telescope; Economical Implementation of a Filter Engine in an FPGA; Improved Joining of Metal Components to Composite Structures; Machined Titanium Heat-Pipe Wick Structure; Gadolinia-Doped Ceria Cathodes for Electrolysis of CO2; Utilizing Ocean Thermal Energy in a Submarine Robot; Fuel-Cell Power Systems Incorporating Mg-Based H2 Generators; Alternative OTEC Scheme for a Submarine Robot; Sensitive, Rapid Detection of Bacterial Spores; Adenosine Monophosphate-Based Detection of Bacterial Spores; Silicon Microleaks for Inlets of Mass Spectrometers; CGH Figure Testing of Aspherical Mirrors in Cold Vacuums; Series-Coupled Pairs of Silica Microresonators; Precise Stabilization of the Optical Frequency of WGMRs; Formation Flying of Components of a Large Space Telescope; Laser Metrology Heterodyne Phase-Locked Loop; Spatial Modulation Improves Performance in CTIS; High-Performance Algorithm for Solving the Diagnosis Problem; Truncation Depth Rule-of-Thumb for Convolutional Codes; Efficient Method for Optimizing Placement of Sensors.

Underground atom gradiometer array for mass distribution monitoring and advanced geodesy

NASA Astrophysics Data System (ADS)

Canuel, B.

2015-12-01

After more than 20 years of fundamental research, atom interferometers have reached sensitivity and accuracy levels competing with or beating inertial sensors based on different technologies. Atom interferometers offer interesting applications in geophysics (gravimetry, gradiometry, Earth rotation rate measurements), inertial sensing (submarine or aircraft autonomous positioning), metrology (new definition of the kilogram) and fundamental physics (tests of the standard model, tests of general relativity). Atom interferometers already contributed significantly to fundamental physics by, for example, providing stringent constraints on quantum-electrodynamics through measurements of the hyperfine structure constant, testing the Equivalence Principle with cold atoms, or providing new measurements for the Newtonian gravitational constant. Cold atom sensors have moreover been established as key instruments in metrology for the new definition of the kilogram or through international comparisons of gravimeters. The field of atom interferometry (AI) is now entering a new phase where very high sensitivity levels must be demonstrated, in order to enlarge the potential applications outside atomic physics laboratories. These applications range from gravitational wave (GW) detection in the [0.1-10 Hz] frequency band to next generation ground and space-based Earth gravity field studies to precision gyroscopes and accelerometers. The Matter-wave laser Interferometric Gravitation Antenna (MIGA) presented here is a large-scale matter-wave sensor which will open new applications in geoscience and fundamental physics. The MIGA consortium gathers 18 expert French laboratories and companies in atomic physics, metrology, optics, geosciences and gravitational physics, with the aim to build a large-scale underground atom-interferometer instrument by 2018 and operate it till at least 2023. In this paper, we present the main objectives of the project, the status of the construction of the instrument and the motivation for the applications of MIGA in geosciences

Tunable Microcavity-Stabilized Quantum Cascade Laser for Mid-IR High-Resolution Spectroscopy and Sensing.

PubMed

Borri, Simone; Siciliani de Cumis, Mario; Insero, Giacomo; Bartalini, Saverio; Cancio Pastor, Pablo; Mazzotti, Davide; Galli, Iacopo; Giusfredi, Giovanni; Santambrogio, Gabriele; Savchenkov, Anatoliy; Eliyahu, Danny; Ilchenko, Vladimir; Akikusa, Naota; Matsko, Andrey; Maleki, Lute; De Natale, Paolo

2016-02-17

The need for highly performing and stable methods for mid-IR molecular sensing and metrology pushes towards the development of more and more compact and robust systems. Among the innovative solutions aimed at answering the need for stable mid-IR references are crystalline microresonators, which have recently shown excellent capabilities for frequency stabilization and linewidth narrowing of quantum cascade lasers with compact setups. In this work, we report on the first system for mid-IR high-resolution spectroscopy based on a quantum cascade laser locked to a CaF₂ microresonator. Electronic locking narrows the laser linewidth by one order of magnitude and guarantees good stability over long timescales, allowing, at the same time, an easy way for finely tuning the laser frequency over the molecular absorption line. Improvements in terms of resolution and frequency stability of the source are demonstrated by direct sub-Doppler recording of a molecular line.

CH3D photomixing spectroscopy up to 2.5 THz: New set of rotational and dipole parameters, first THz self-broadening measurements

NASA Astrophysics Data System (ADS)

Bray, Cédric; Cuisset, Arnaud; Hindle, Francis; Bocquet, Robin; Mouret, Gaël; Drouin, Brian J.

2017-03-01

Several previously unmeasured transitions of 12CH3D have been recorded by a terahertz photomixing continuous-wave spectrometer up to QR(10) branch at 2.5 THz. An improved set of rotational constants has been obtained utilizing a THz frequency metrology based on a frequency comb that achieved an averaged frequency position better than 150 kHz on more than fifty ground-state transitions. A detailed analysis of the measured line intensities was undertaken using the multispectrum fitting program and has resulted in a determination of new dipole moment parameters. Measurements at different pressures of the QR(7) transitions provide the first determination of self-broadening coefficients from pure rotational CH3D lines. The THz rotational measurements are consistent with IR rovibrational data but no significant vibrational dependence of self-broadening coefficient may be observed by comparison.

Tunable Microcavity-Stabilized Quantum Cascade Laser for Mid-IR High-Resolution Spectroscopy and Sensing

PubMed Central

Borri, Simone; Siciliani de Cumis, Mario; Insero, Giacomo; Bartalini, Saverio; Cancio Pastor, Pablo; Mazzotti, Davide; Galli, Iacopo; Giusfredi, Giovanni; Santambrogio, Gabriele; Savchenkov, Anatoliy; Eliyahu, Danny; Ilchenko, Vladimir; Akikusa, Naota; Matsko, Andrey; Maleki, Lute; De Natale, Paolo

2016-01-01

The need for highly performing and stable methods for mid-IR molecular sensing and metrology pushes towards the development of more and more compact and robust systems. Among the innovative solutions aimed at answering the need for stable mid-IR references are crystalline microresonators, which have recently shown excellent capabilities for frequency stabilization and linewidth narrowing of quantum cascade lasers with compact setups. In this work, we report on the first system for mid-IR high-resolution spectroscopy based on a quantum cascade laser locked to a CaF2 microresonator. Electronic locking narrows the laser linewidth by one order of magnitude and guarantees good stability over long timescales, allowing, at the same time, an easy way for finely tuning the laser frequency over the molecular absorption line. Improvements in terms of resolution and frequency stability of the source are demonstrated by direct sub-Doppler recording of a molecular line. PMID:26901199

Dimensional metrology of smooth micro structures utilizing the spatial modulation of white-light interference fringes

NASA Astrophysics Data System (ADS)

Zhou, Yi; Tang, Yan; Deng, Qinyuan; Liu, Junbo; Wang, Jian; Zhao, Lixin

2017-08-01

Dimensional metrology for micro structure plays an important role in addressing quality issues and observing the performance of micro-fabricated products. In white light interferometry, the proposed method is expected to measure three-dimensional topography through modulation depth in spatial frequency domain. A normalized modulation depth is first obtained in the xy plane (image plane) for each CCD image individually. After that, the modulation depth of each pixel is analyzed along the scanning direction (z-axis) to reshape the topography of micro samples. Owing to the characteristics of modulation depth in broadband light interferometry, the method could effectively suppress the negative influences caused by light fluctuations and external irradiance disturbance. Both theory and experiments are elaborated in detail to verify that the modulation depth-based method can greatly level up the stability and sensitivity with satisfied precision in the measurement system. This technique can achieve an improved robustness in a complex measurement environment with the potential to be applied in online topography measurement such as chemistry and medical domains.

Laser modulator for LISA pathfinder

NASA Astrophysics Data System (ADS)

Voland, C.; Lund, G.; Coppoolse, W.; Crosby, P.; Stadler, M.; Kudielka, K.; Özkan, C.

2017-11-01

LISA Pathfinder is an ESA experiment to demonstrate the key technologies needed for the LISA mission to detect gravitational waves in space. The LISA Pathfinder spacecraft represents one arm of the LISA interferometer, containing an optical metrology system and two proof masses as inertial references for the drag-free control system. The LISA Pathfinder payload consists of two drag-free floating test masses located in the inertial sensors with their control electronics and an optical metrology subsystem. The optical metrology subsystem monitors the movement of both test masses relative to each other and to the spacecraft with very high sensitivity and resolution. This is achieved with a heterodyne Mach- Zehnder interferometer. This interferometer requires as input two coherent laser beams with a heterodyne frequency difference of a few kHz. To generate the two laser beams with a heterodyne frequency difference a Nd:YAG laser is used together with the Laser Modulator. The Nd:YAG laser generates a single coherent laser signal at a wavelength of 1064nm which is fibre coupled to the Laser Modulator. The Laser Modulator then generates the two optical beams with the required heterodyne frequency offset. In addition, the Laser Modulator is required to perform laser amplitude stabilization and optical path difference control for the two optical signals. The Laser Modulator consists of an optical unit - the LMU - and RF synthesiser, power amplification and control electronics. These electronics are all housed in the Laser Modulator Electronics (LME). The LMU has four primary functions: • Splitting of the input laser beam into two paths for later superposition in the interferometer. • Applying different frequency shifts to each of the beams. • Providing amplitude modulation control to each of the beams. • Providing active control of the optical path length difference between the two optical paths. The present paper describes the design and performance of the LMU together with a summary of the results of the Laser Modulator engineering model test campaign.

Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach

DOE Office of Scientific and Technical Information (OSTI.GOV)

Su P.; Kaznatcheev K.; Wang, Y.

In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision and accuracy better than 100 nrad (rms) and {approx}200 nrad (rms), respectively, with a lateral resolution of few mm or less. We present results of the calibration of the metrology systems, discuss their accuracy and address the precision in measuring amore » spherical mirror.« less

Joint Research on Scatterometry and AFM Wafer Metrology

NASA Astrophysics Data System (ADS)

Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

2011-11-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

Hybrid enabled thin film metrology using XPS and optical

NASA Astrophysics Data System (ADS)

Vaid, Alok; Iddawela, Givantha; Mahendrakar, Sridhar; Lenahan, Michael; Hossain, Mainul; Timoney, Padraig; Bello, Abner F.; Bozdog, Cornel; Pois, Heath; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Kang, Byung Cheol; Isbester, Paul; Sendelbach, Matthew; Yellai, Naren; Dasari, Prasad; Larson, Tom

2016-03-01

Complexity of process steps integration and material systems for next-generation technology nodes is reaching unprecedented levels, the appetite for higher sampling rates is on the rise, while the process window continues to shrink. Current thickness metrology specifications reach as low as 0.1A for total error budget - breathing new life into an old paradigm with lower visibility for past few metrology nodes: accuracy. Furthermore, for advance nodes there is growing demand to measure film thickness and composition on devices/product instead of surrogate planar simpler pads. Here we extend our earlier work in Hybrid Metrology to the combination of X-Ray based reference technologies (high performance) with optical high volume manufacturing (HVM) workhorse metrology (high throughput). Our stated goal is: put more "eyes" on the wafer (higher sampling) and enable move to films on pattern structure (control what matters). Examples of 1X front-end applications are used to setup and validate the benefits.

Metrology needs for the semiconductor industry over the next decade

NASA Astrophysics Data System (ADS)

Melliar-Smith, Mark; Diebold, Alain C.

1998-11-01

Metrology will continue to be a key enabler for the development and manufacture of future generations of integrated circuits. During 1997, the Semiconductor Industry Association renewed the National Technology Roadmap for Semiconductors (NTRS) through the 50 nm technology generation and for the first time included a Metrology Roadmap (1). Meeting the needs described in the Metrology Roadmap will be both a technological and financial challenge. In an ideal world, metrology capability would be available at the start of process and tool development, and silicon suppliers would have 450 mm wafer capable metrology tools in time for development of that wafer size. Unfortunately, a majority of the metrology suppliers are small companies that typically can't afford the additional two to three year wait for return on R&D investment. Therefore, the success of the semiconductor industry demands that we expand cooperation between NIST, SEMATECH, the National Labs, SRC, and the entire community. In this paper, we will discuss several critical metrology topics including the role of sensor-based process control, in-line microscopy, focused measurements for transistor and interconnect fabrication, and development needs. Improvements in in-line microscopy must extend existing critical dimension measurements up to 100 nm generations and new methods may be required for sub 100 nm generations. Through development, existing metrology dielectric thickness and dopant dose and junction methods can be extended to 100 nm, but new and possibly in-situ methods are needed beyond 100 nm. Interconnect process control will undergo change before 100 nm due to the introduction of copper metallization, low dielectric constant interlevel dielectrics, and Damascene process flows.

Radiation comb generation with extended Josephson junctions

DOE Office of Scientific and Technical Information (OSTI.GOV)

Solinas, P., E-mail: paolo.solinas@spin.cnr.it; Bosisio, R., E-mail: riccardo.bosisio@nano.cnr.it; NEST, Instituto Nanoscienze-CNR and Scuola Normale Superiore, I-56127 Pisa

2015-09-21

We propose the implementation of a Josephson radiation comb generator based on an extended Josephson junction subject to a time dependent magnetic field. The junction critical current shows known diffraction patterns and determines the position of the critical nodes when it vanishes. When the magnetic flux passes through one of such critical nodes, the superconducting phase must undergo a π-jump to minimize the Josephson energy. Correspondingly, a voltage pulse is generated at the extremes of the junction. Under periodic driving, this allows us to produce a comb-like voltage pulses sequence. In the frequency domain, it is possible to generate upmore » to hundreds of harmonics of the fundamental driving frequency, thus mimicking the frequency comb used in optics and metrology. We discuss several implementations through a rectangular, cylindrical, and annular junction geometries, allowing us to generate different radiation spectra and to produce an output power up to 10 pW at 50 GHz for a driving frequency of 100 MHz.« less

The Development of a Deflectometer for Accurate Surface Figure Metrology

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Eberhardt, Andrew; Ramsey, Brian; Atkins, Carolyn

2015-01-01

Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Soufli, Regina; Baker, Sherry L.; Windt, David L.

2007-06-01

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV)wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM). The AFM measurements revealed features in the topography of each substrate that are associated with specific polishing techniques. Theoretical predictions of the mirror performance based on the AFM-measured high-spatial-frequency roughness are in good agreement withmore » EUV reflectance measurements of the mirrors after multilayer coating.« less

Absolute optical metrology : nanometers to kilometers

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge; Lay, O. P.; Peters, R. D.; Liebe, C. C.

2005-01-01

We provide and overview of the developments in the field of high-accuracy absolute optical metrology with emphasis on space-based applications. Specific work on the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor is described along with novel applications of the sensor.

The European Comparison of Absolute Gravimeters 2011 (ECAG-2011) in Walferdange, Luxembourg: results and recommendations

NASA Astrophysics Data System (ADS)

Francis, Olivier; Baumann, Henri; Volarik, Tomas; Rothleitner, Christian; Klein, Gilbert; Seil, Marc; Dando, Nicolas; Tracey, Ray; Ullrich, Christian; Castelein, Stefaan; Hua, Hu; Kang, Wu; Chongyang, Shen; Songbo, Xuan; Hongbo, Tan; Zhengyuan, Li; Pálinkás, Vojtech; Kostelecký, Jakub; Mäkinen, Jaakko; Näränen, Jyri; Merlet, Sébastien; Farah, Tristan; Guerlin, Christine; Pereira Dos Santos, Franck; Le Moigne, Nicolas; Champollion, Cédric; Deville, Sabrina; Timmen, Ludger; Falk, Reinhard; Wilmes, Herbert; Iacovone, Domenico; Baccaro, Francesco; Germak, Alessandro; Biolcati, Emanuele; Krynski, Jan; Sekowski, Marcin; Olszak, Tomasz; Pachuta, Andrzej; Agren, Jonas; Engfeldt, Andreas; Reudink, René; Inacio, Pedro; McLaughlin, Daniel; Shannon, Geoff; Eckl, Marc; Wilkins, Tim; van Westrum, Derek; Billson, Ryan

2013-06-01

We present the results of the third European Comparison of Absolute Gravimeters held in Walferdange, Grand Duchy of Luxembourg, in November 2011. Twenty-two gravimeters from both metrological and non-metrological institutes are compared. For the first time, corrections for the laser beam diffraction and the self-attraction of the gravimeters are implemented. The gravity observations are also corrected for geophysical gravity changes that occurred during the comparison using the observations of a superconducting gravimeter. We show that these corrections improve the degree of equivalence between the gravimeters. We present the results for two different combinations of data. In the first one, we use only the observations from the metrological institutes. In the second solution, we include all the data from both metrological and non-metrological institutes. Those solutions are then compared with the official result of the comparison published previously and based on the observations of the metrological institutes and the gravity differences at the different sites as measured by non-metrological institutes. Overall, the absolute gravity meters agree with one another with a standard deviation of 3.1 µGal. Finally, the results of this comparison are linked to previous ones. We conclude with some important recommendations for future comparisons.

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform

PubMed Central

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-01-01

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform’s mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument’s working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform. PMID:27869722

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform.

PubMed

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-11-18

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform's mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument's working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform.

Analysis of key technologies for virtual instruments metrology

NASA Astrophysics Data System (ADS)

Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

2008-12-01

Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

METAS Time & Frequency Metrology Report

DTIC Science & Technology

2009-11-01

TWSTFT link is used to connect UTC (CH) to UTC and TAI. In addition, two calibrated GPS links are operated as backups for the TWSTFT link. TIME... TWSTFT AND GPS LINKS METAS has been equipped with a Two-Way Satellite Time and Frequency Transfer ( TWSTFT ) terminal since 2007. After the first...calibration of the METAS-PTB link, the TWSTFT link became the official TAI link in July 2007. The most recent link calibration was performed in

Interferometry-based free space communication and information processing

NASA Astrophysics Data System (ADS)

Arain, Muzammil Arshad

This dissertation studies, analyzes, and experimentally demonstrates the innovative use of interference phenomenon in the field of opto-electronic information processing and optical communications. A number of optical systems using interferometric techniques both in the optical and the electronic domains has been demonstrated in the filed of signal transmission and processing, optical metrology, defense, and physical sensors. Specifically it has been shown that the interference of waves in the form of holography can be exploited to realize a novel optical scanner called Code Multiplexed Optical Scanner (C-MOS). The C-MOS features large aperture, wide scan angles, 3-D beam control, no moving parts, and high beam scanning resolution. A C-MOS based free space optical transceiver for bi-directional communication has also been experimentally demonstrated. For high speed, large bandwidth, and high frequency operation, an optically implemented reconfigurable RF transversal filter design is presented that implements wide range of filtering algorithms. A number of techniques using heterodyne interferometry via acousto-optic device for optical path length measurements have been described. Finally, a whole new class of interferometric sensors for optical metrology and sensing applications is presented. A non-traditional interferometric output signal processing scheme has been developed. Applications include, for example, temperature sensors for harsh environments for a wide temperature range from room temperature to 1000°C.

Evaluating diffraction based overlay metrology for double patterning technologies

NASA Astrophysics Data System (ADS)

Saravanan, Chandra Saru; Liu, Yongdong; Dasari, Prasad; Kritsun, Oleg; Volkman, Catherine; Acheta, Alden; La Fontaine, Bruno

2008-03-01

Demanding sub-45 nm node lithographic methodologies such as double patterning (DPT) pose significant challenges for overlay metrology. In this paper, we investigate scatterometry methods as an alternative approach to meet these stringent new metrology requirements. We used a spectroscopic diffraction-based overlay (DBO) measurement technique in which registration errors are extracted from specially designed diffraction targets for double patterning. The results of overlay measurements are compared to traditional bar-in-bar targets. A comparison between DBO measurements and CD-SEM measurements is done to show the correlation between the two approaches. We discuss the total measurement uncertainty (TMU) requirements for sub-45 nm nodes and compare TMU from the different overlay approaches.

First uncertainty evaluation of the FoCS-2 primary frequency standard

NASA Astrophysics Data System (ADS)

Jallageas, A.; Devenoges, L.; Petersen, M.; Morel, J.; Bernier, L. G.; Schenker, D.; Thomann, P.; Südmeyer, T.

2018-06-01

We report the uncertainty evaluation of the Swiss continuous primary frequency standard FoCS-2 (Fontaine Continue Suisse). Unlike other primary frequency standards which are working with clouds of cold atoms, this fountain uses a continuous beam of cold caesium atoms bringing a series of metrological advantages and specific techniques for the evaluation of the uncertainty budget. Recent improvements of FoCS-2 have made possible the evaluation of the frequency shifts and of their uncertainties in the order of . When operating in an optimal regime a relative frequency instability of is obtained. The relative standard uncertainty reported in this article, , is strongly dominated by the statistics of the frequency measurements.

Forensic Metrology: Its Importance and Evolution in the United States

NASA Astrophysics Data System (ADS)

Vosk, JD Ted

2016-11-01

Forensic measurements play a significant role in the U.S. criminal justice system. Guilt or innocence, or the severity of a sentence, may depend upon the results of such measurements. Until recently, however, forensic disciplines were largely unaware of the field of metrology. Accordingly, proper measurement practices were often, and widely, neglected. These include failure to adopt proper calibration techniques, establish the traceability of results and determine measurement uncertainty. These failures undermine confidence in verdicts based upon forensic measurements. Over the past decade, though, the forensic sciences have been introduced to metrology and its principles leading to more reliable measurement practices. The impetus for this change was driven by many forces. Pressure came initially from criminal defense lawyers challenging metrologically unsound practices and results relied upon by government prosecutions. Litigation in the State of Washington led this movement spurring action by attorneys in other jurisdictions and eventually reform in the measurement practices of forensic labs around the country. Since then, the greater scientific community, other forensic scientists and even prosecutors have joined the fight. This paper describes the fight to improve the quality of justice by the application of metrological principles and the evolution of the field of forensic metrology.

Performance of ASML YieldStar μDBO overlay targets for advanced lithography nodes C028 and C014 overlay process control

NASA Astrophysics Data System (ADS)

Blancquaert, Yoann; Dezauzier, Christophe; Depre, Jerome; Miqyass, Mohamed; Beltman, Jan

2013-04-01

Continued tightening of overlay control budget in semiconductor lithography drives the need for improved metrology capabilities. Aggressive improvements are needed for overlay metrology speed, accuracy and precision. This paper is dealing with the on product metrology results of a scatterometry based platform showing excellent production results on resolution, precision, and tool matching for overlay. We will demonstrate point to point matching between tool generations as well as between target sizes and types. Nowadays, for the advanced process nodes a lot of information is needed (Higher order process correction, Reticle fingerprint, wafer edge effects) to quantify process overlay. For that purpose various overlay sampling schemes are evaluated: ultra- dense, dense and production type. We will show DBO results from multiple target type and shape for on product overlay control for current and future node down to at least 14 nm node. As overlay requirements drive metrology needs, we will evaluate if the new metrology platform meets the overlay requirements.

64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

NASA Astrophysics Data System (ADS)

Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe

2015-03-01

Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.

Metrological characterization of 3D imaging devices

NASA Astrophysics Data System (ADS)

Guidi, G.

2013-04-01

Manufacturers often express the performance of a 3D imaging device in various non-uniform ways for the lack of internationally recognized standard requirements for metrological parameters able to identify the capability of capturing a real scene. For this reason several national and international organizations in the last ten years have been developing protocols for verifying such performance. Ranging from VDI/VDE 2634, published by the Association of German Engineers and oriented to the world of mechanical 3D measurements (triangulation-based devices), to the ASTM technical committee E57, working also on laser systems based on direct range detection (TOF, Phase Shift, FM-CW, flash LADAR), this paper shows the state of the art about the characterization of active range devices, with special emphasis on measurement uncertainty, accuracy and resolution. Most of these protocols are based on special objects whose shape and size are certified with a known level of accuracy. By capturing the 3D shape of such objects with a range device, a comparison between the measured points and the theoretical shape they should represent is possible. The actual deviations can be directly analyzed or some derived parameters can be obtained (e.g. angles between planes, distances between barycenters of spheres rigidly connected, frequency domain parameters, etc.). This paper shows theoretical aspects and experimental results of some novel characterization methods applied to different categories of active 3D imaging devices based on both principles of triangulation and direct range detection.

QCL- and CO_2 Laser-Based Mid-Ir Spectrometers for High Accuracy Molecular Spectroscopy

NASA Astrophysics Data System (ADS)

Sow, P. L. T.; Chanteau, B.; Auguste, F.; Mejri, S.; Tokunaga, S. K.; Argence, B.; Lopez, O.; Chardonnet, C.; Amy-Klein, A.; Daussy, C.; Darquie, B.; Nicolodi, D.; Abgrall, M.; Le Coq, Y.; Santarelli, G.

2013-06-01

With their rich internal structure, molecules can play a decisive role in precision tests of fundamental physics. They are now being used, for example in our group, to test fundamental symmetries such as parity and time reversal, and to measure either absolute values of fundamental constants or their temporal variation. Most of those experiments can be cast as the measurement of molecular frequencies. Ultra-stable and accurate sources in the mid-IR spectral region, the so-called molecular fingerprint region that hosts many intense rovibrational signatures, are thus highly desirable. We report on the development of a widely tunable quantum cascade laser (QCL) based spectrometer. Our first characterization of a free-running cw near-room-temperature DFB 10.3 μm QCL led to a ˜200 kHz linewidth beat-note with our frequency-stabilized CO_2 laser. Narrowing of the QCL linewidth was achieved by straightforwardly phase-locking the QCL to the CO_2 laser. The great stability of the CO_2 laser was transferred to the QCL resulting in a record linewidth of a few tens of hertz. The use of QCLs will allow the study of any species showing absorption between 3 and 25 μm which will broaden the scope of our experimental setups dedicated to molecular spectroscopy-based precision measurements. Eventually we want to lock the QCL to a frequency comb itself stabilized to an ultra-stable near-IR reference provided via a 43-km long fibre by the French metrological institute and monitored against atomic fountain clocks. We report on the demonstration of this locking-scheme with a ˜10 μm CO_2 laser resulting in record 10^{-14}-10^{-15} fractional accuracy and stability. Stabilizing a QCL this way will free us from having to lock it to a molecular transition or a CO_2 laser. It will make it possible for any laboratory to have a stabilized QCL at any desired wavelength with spectral performances currently only achievable in the visible and near-IR, in metrological institutes.

Reference Materials for Food and Nutrition Metrology: Past, Present and Future

USDA-ARS?s Scientific Manuscript database

Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970’s the first “biological” RM of Bowens Kale, as well as Orchard Leaves and Bovine Liver SRMs, from the ...

Photomask applications of traceable atomic force microscope dimensional metrology at NIST

NASA Astrophysics Data System (ADS)

Dixson, Ronald; Orji, Ndubuisi G.; Potzick, James; Fu, Joseph; Allen, Richard A.; Cresswell, Michael; Smith, Stewart; Walton, Anthony J.; Tsiamis, Andreas

2007-10-01

The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. Three major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C-AFM), the second is the first generation of commercially available critical dimension AFM (CD-AFM), and the third is a current generation CD-AFM at SEMATECH - for which NIST has established the calibration and uncertainties. All of these instruments have useful applications in photomask metrology. Linewidth reference metrology is an important application of CD-AFM. We have performed a preliminary comparison of linewidths measured by CD-AFM and by electrical resistance metrology on a binary mask. For the ten selected test structures with on-mask linewidths between 350 nm and 600 nm, most of the observed differences were less than 5 nm, and all of them were less than 10 nm. The offsets were often within the estimated uncertainties of the AFM measurements, without accounting for the effect of linewidth roughness or the uncertainties of electrical measurements. The most recent release of the NIST photomask standard - which is Standard Reference Material (SRM) 2059 - was also supported by CD-AFM reference measurements. We review the recent advances in AFM linewidth metrology that will reduce the uncertainty of AFM measurements on this and future generations of the NIST photomask standard. The NIST C-AFM has displacement metrology for all three axes traceable to the 633 nm wavelength of the iodine-stabilized He-Ne laser. One of the important applications of the C-AFM is step height metrology, which has some relevance to phase shift calibration. In the current generation of the system, the approximate level of relative standard uncertainty for step height measurements at the 100 nm scale is 0.1 %. We discuss the monitor history of a 290 nm step height, originally measured on the C-AFM with a 1.9 nm (k = 2) expanded uncertainty, and describe advances that bring the step height uncertainty of recent measurements to an estimated 0.6 nm (k = 2). Based on this work, we expect to be able to reduce the topographic component of phase uncertainty in alternating aperture phase shift masks (AAPSM) by a factor of three compared to current calibrations based on earlier generation step height references.

Relativistic Quantum Metrology: Exploiting relativity to improve quantum measurement technologies

PubMed Central

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-01-01

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects. PMID:24851858

Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

PubMed

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-05-22

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

Russian national time scale long-term stability

NASA Astrophysics Data System (ADS)

Alshina, A. P.; Gaigerov, B. A.; Koshelyaevsky, N. B.; Pushkin, S. B.

1994-05-01

The Institute of Metrology for Time and Space NPO 'VNIIFTRI' generates the National Time Scale (NTS) of Russia -- one of the most stable time scales in the world. Its striking feature is that it is based on a free ensemble of H-masers only. During last two years the estimations of NTS longterm stability based only on H-maser intercomparison data gives a flicker floor of about (2 to 3) x 10(exp -15) for averaging times from 1 day to 1 month. Perhaps the most significant feature for a time laboratory is an extremely low possible frequency drift -- it is too difficult to estimate it reliably. The other estimations, free from possible inside the ensemble correlation phenomena, are available based on the time comparison of NTS relative to the stable enough time scale of outer laboratories. The data on NTS comparison relative to the time scale of secondary time and frequency standards at Golitzino and Irkutsk in Russia and relative to NIST, PTB and USNO using GLONASS and GPS time transfer links gives stability estimations which are close to that based on H-maser intercomparisons.

Russian national time scale long-term stability

NASA Technical Reports Server (NTRS)

Alshina, A. P.; Gaigerov, B. A.; Koshelyaevsky, N. B.; Pushkin, S. B.

1994-01-01

The Institute of Metrology for Time and Space NPO 'VNIIFTRI' generates the National Time Scale (NTS) of Russia -- one of the most stable time scales in the world. Its striking feature is that it is based on a free ensemble of H-masers only. During last two years the estimations of NTS longterm stability based only on H-maser intercomparison data gives a flicker floor of about (2 to 3) x 10(exp -15) for averaging times from 1 day to 1 month. Perhaps the most significant feature for a time laboratory is an extremely low possible frequency drift -- it is too difficult to estimate it reliably. The other estimations, free from possible inside the ensemble correlation phenomena, are available based on the time comparison of NTS relative to the stable enough time scale of outer laboratories. The data on NTS comparison relative to the time scale of secondary time and frequency standards at Golitzino and Irkutsk in Russia and relative to NIST, PTB and USNO using GLONASS and GPS time transfer links gives stability estimations which are close to that based on H-maser intercomparisons.

Aging studies on micro-fabricated alkali buffer-gas cells for miniature atomic clocks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Abdullah, S.; Affolderbach, C.; Gruet, F.

2015-04-20

We report an aging study on micro-fabricated alkali vapor cells using neon as a buffer gas. An experimental atomic clock setup is used to measure the cell's intrinsic frequency, by recording the clock frequency shift at different light intensities and extrapolating to zero intensity. We find a drift of the cell's intrinsic frequency of (−5.2 ± 0.6) × 10{sup −11}/day and quantify deterministic variations in sources of clock frequency shifts due to the major physical effects to identify the most probable cause of the drift. The measured drift is one order of magnitude stronger than the total frequency variations expected from clock parameter variationsmore » and corresponds to a slow reduction of buffer gas pressure inside the cell, which is compatible with the hypothesis of loss of Ne gas from the cell due to its permeation through the cell windows. A negative drift on the intrinsic cell frequency is reproducible for another cell of the same type. Based on the Ne permeation model and the measured cell frequency drift, we determine the permeation constant of Ne through borosilicate glass as (5.7 ± 0.7) × 10{sup −22} m{sup 2} s{sup −1 }Pa{sup −1} at 81 °C. We propose this method based on frequency metrology in an alkali vapor cell atomic clock setup based on coherent population trapping for measuring permeation constants of inert gases.« less

Optical testbed for the LISA phasemeter

NASA Astrophysics Data System (ADS)

Schwarze, T. S.; Fernández Barranco, G.; Penkert, D.; Gerberding, O.; Heinzel, G.; Danzmann, K.

2016-05-01

The planned spaceborne gravitational wave detector LISA will allow the detection of gravitational waves at frequencies between 0.1 mHz and 1 Hz. A breadboard model for the metrology system aka the phasemeter was developed in the scope of an ESA technology development project by a collaboration between the Albert Einstein Institute, the Technical University of Denmark and the Danish industry partner Axcon Aps. It in particular provides the electronic readout of the main interferometer phases besides auxiliary functions. These include clock noise transfer, ADC pilot tone correction, inter-satellite ranging and data transfer. Besides in LISA, the phasemeter can also be applied in future satellite geodesy missions. Here we show the planning and advances in the implementation of an optical testbed for the full metrology chain. It is based on an ultra-stable hexagonal optical bench. This bench allows the generation of three unequal heterodyne beatnotes with a zero phase combination, thus providing the possibility to probe the phase readout for non-linearities in an optical three signal test. Additionally, the utilization of three independent phasemeters will allow the testing of the auxiliary functions. Once working, components can individually be replaced with flight-qualified hardware in this setup.

The frequency and time standard and activities at the Beijing Institute of Radio Metrology and Measurements. [China

NASA Technical Reports Server (NTRS)

Wang, H. T.

1979-01-01

Three kinds of frequency measuring systems are described: frequency comparison, phase comparison, and time comparison. With the help of the portable cesium clock in determining the time delay between two stations, a time synchronization, experiment was conducted using the Symphonie satellite. A result with an accuracy of 30 ns and an uncertainty of about 10 ns was obtained. Another experiment, applying the television pulse technique for time synchronization, yielded a result with an error of about 0.5 mu s in 24 hours. In order to measure the short term frequency stability of crystal oscillators or other frequency sources, a rubidium maser atomic frequency standard was developed as well as a short term stability measuring system.

Four-wave mixing parametric oscillation and frequency comb generation at visible wavelengths in a silica microbubble resonator.

PubMed

Yang, Yong; Jiang, Xuefeng; Kasumie, Sho; Zhao, Guangming; Xu, Linhua; Ward, Jonathan M; Yang, Lan; Chormaic, Síle Nic

2016-11-15

Frequency comb generation in microresonators at visible wavelengths has found applications in a variety of areas such as metrology, sensing, and imaging. To achieve Kerr combs based on four-wave mixing in a microresonator, dispersion must be in the anomalous regime. In this Letter, we demonstrate dispersion engineering in a microbubble resonator (MBR) fabricated by a two-CO₂ laser beam technique. By decreasing the wall thickness of the MBR to 1.4 μm, the zero dispersion wavelength shifts to values shorter than 764 nm, making phase matching possible around 765 nm. With the optical Q-factor of the MBR modes being greater than 10⁷, four-wave mixing is observed at 765 nm for a pump power of 3 mW. By increasing the pump power, parametric oscillation is achieved, and a frequency comb with 14 comb lines is generated at visible wavelengths.

Scaling of Yb-Fiber Frequency Combs

NASA Astrophysics Data System (ADS)

Ruehl, Axel; Marcinkevicius, Andrius; Fermann, Martin E.; Hartl, Ingmar

2010-06-01

Immediately after their introduction in 1999, femtosecond laser frequency combs revolutionized the field of precision optical frequency metrology and are key elements in many experiments. Frequency combs based on femtosecond Er-fiber lasers based were demonstrated in 2005, allowing additionally rugged, compact set-ups and reliable unattended long-term operation. The introduction of Yb-fiber technology led to an dramatic improvement in fiber-comb performance in various aspects. Low-noise Yb-fiber femtosecond oscillators enabled a reduction of relative comb tooth linewidth to the sub-Hz level as well as scaling of the fundamental comb spacings up to 1 GHz. This is beneficial for any frequency-domain comb application due to the higher power per comb-mode. Many spectroscopic applications require, however, frequency combs way beyond the wavelength range accessible with broad band laser materials, so nonlinear conversion and hence higher peak intensity is required. We demonstrated power scaling of Yb-fiber frequency combs up to 80 W average power in a strictly linear chirped-pulse amplification schemes compatible with low-noise phase control. These high-power Yb-fiber-frequency combs facilitated not only the extension to the mid-IR spectral region. When coupled to a passive enhancement cavity, the average power can be further scaled to the kW-level opening new capabilities for XUV frequency combs via high-harmonic generation. All these advances of fiber-based frequency combs will trigger many novel applications both in fundamental and applied sciences. Schibli et al., Nature Photonics 2 355 (2008). Hartl et al., MF9 in Advanced Solid-State Photonics. 2009, Optical Society of America. Ruehl et al., AWC7 in Advanced Solid-State Photonics. 2010, Optical Society of America. Adler et al., Optics Letters 34 1330 (2009). Yost et al., Nature Physics 5 815 (2009).

Productivity Measurement in R&D: Productivity Measurement Experiment (PROMEX) in Selected Research and Development Programs at the National Bureau of Standards

DTIC Science & Technology

1975-12-01

Frequency Standards R. A. Kamper, Cryoelectronics D. B. Mann, Cryogenic Metrology Other Contributors: T. Dillon S. Dunaway J. Ellermeier K. T. Higgins R...research projects could be continuously assessed. Lipetz,, Ben-Ami. The Measueement of Efficiency of Scientific Research. Intermedia , Inc., Carlisle

Final report of supplementary comparison AFRIMETS.AUV.A-S1: primary pressure calibration of LS2aP microphones according to IEC 61094-2, over the frequency range 1 Hz to 31.5 kHz.

NASA Astrophysics Data System (ADS)

Nel, R.; Barrera-Figueroa, S.; Dobrowolska, D.; Defilippo Soares, Z. M.; Maina, A. K.; Hof, C.

2016-01-01

This is the final report of the AFRIMETS.AUV-S1 comparison of the pressure sensitivity, modulus and phase, of LS2aP microphones in the frequency range 1 Hz to 31.5 kHz in accordance with IEC 61094-2. Six national metrology institutes from three different regional metrology organisations participated in the comparison for which two LS2aP microphones were circulated simultaneously to all the participants in a hybrid-star configuration. The comparison reference values were calculated as the weighted mean for modulus and phase for each individual microphone. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Final report on the regional supplementary comparison APMP.AUV.A-S1

NASA Astrophysics Data System (ADS)

Plangsangmas, Virat; Leeudomwong, Surat; Scott, Andrew; Zhong, Bo; Huang, Yuchung

2014-01-01

A regional supplementary comparison APMP.AUV.A-S1 has been carried out for the measurement of sound pressure level, frequency and total distortion of a multi-frequency sound calibrator. The role of the Pilot laboratory was undertaken by the National Institute of Metrology (Thailand) (NIMT). The multi-frequency sound calibrator was circulated through thirteen National Metrology Institutes (NMIs). Two NMIs were added to the original time schedule after starting the circulation. The measurements took place between September 2008 and July 2010. This report includes the measurement results from all the participants. Supplementary Comparison Reference Values (SCRVs) have been determined from the results. Deviations from the SCRVs are mostly within declared expanded uncertainties. It has been found that a term for the inherent instability in this type of device needs to be included in any uncertainty budget, and a recommended minimum value of this has been given. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology laboratory requirements for third-generation synchrotron radiation sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takacs, P.Z.; Quian, Shinan

1997-11-01

New third-generation synchrotron radiation sources that are now, or will soon, come on line will need to decide how to handle the testing of optical components delivered for use in their beam lines. In many cases it is desirable to establish an in-house metrology laboratory to do the work. We review the history behind the formation of the Optical Metrology Laboratory at Brookhaven National Laboratory and the rationale for its continued existence. We offer suggestions to those who may be contemplating setting up similar facilities, based on our experiences over the past two decades.

Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

NASA Astrophysics Data System (ADS)

Upputuri, Paul Kumar; Pramanik, Manojit

2018-02-01

Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

Trade-off between linewidth and slip rate in a mode-locked laser model.

PubMed

Moore, Richard O

2014-05-15

We demonstrate a trade-off between linewidth and loss-of-lock rate in a mode-locked laser employing active feedback to control the carrier-envelope offset phase difference. In frequency metrology applications, the linewidth translates directly to uncertainty in the measured frequency, whereas the impact of lock loss and recovery on the measured frequency is less well understood. We reduce the dynamics to stochastic differential equations, specifically diffusion processes, and compare the linearized linewidth to the rate of lock loss determined by the mean time to exit, as calculated from large deviation theory.

History of reference materials for food and nutrition metrology: As represented in the series of BERM Symposia

USDA-ARS?s Scientific Manuscript database

Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970s the first “biological” Reference Material (RM) of Bowens Kale, Orchard Leaves, and Bovine Liver from ...

In-line height profiling metrology sensor for zero defect production control

NASA Astrophysics Data System (ADS)

Snel, Rob; Winters, Jasper; Liebig, Thomas; Jonker, Wouter

2017-06-01

Contemporary production systems of mechanical precision parts show challenges as increased complexity, tolerances shrinking to sub-microns and yield losses that must be mastered to the extreme. More advanced automation and process control is required to accomplish this task. Often a solution based on feedforward/feedback control is chosen requiring innovative and more advanced in line metrology. This article concentrates first on the context of in line metrology for process control and then on the development of a specific in line height profiling sensor. The novel sensor technology is based on full field time domain white light interferometry which is well know from the quality lab. The novel metrology system is to be mounted close to the production equipment, as required to minimize time delay in the control loop, and is thereby fully exposed to vibrations. This sensor is innovated to perform in line with an orders of magnitude faster throughput than laboratory instruments; it's robust to withstand the rigors of workshops and has a height resolution that is in the nanometer range.

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

NASA Astrophysics Data System (ADS)

Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

2017-03-01

On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

Photonic microwave signals with zeptosecond-level absolute timing noise

NASA Astrophysics Data System (ADS)

Xie, Xiaopeng; Bouchand, Romain; Nicolodi, Daniele; Giunta, Michele; Hänsel, Wolfgang; Lezius, Matthias; Joshi, Abhay; Datta, Shubhashish; Alexandre, Christophe; Lours, Michel; Tremblin, Pierre-Alain; Santarelli, Giorgio; Holzwarth, Ronald; Le Coq, Yann

2017-01-01

Photonic synthesis of radiofrequency (RF) waveforms revived the quest for unrivalled microwave purity because of its ability to convey the benefits of optics to the microwave world. In this work, we perform a high-fidelity transfer of frequency stability between an optical reference and a microwave signal via a low-noise fibre-based frequency comb and cutting-edge photodetection techniques. We demonstrate the generation of the purest microwave signal with a fractional frequency stability below 6.5 × 10-16 at 1 s and a timing noise floor below 41 zs Hz-1/2 (phase noise below -173 dBc Hz-1 for a 12 GHz carrier). This outperforms existing sources and promises a new era for state-of-the-art microwave generation. The characterization is achieved through a heterodyne cross-correlation scheme with the lowermost detection noise. This unprecedented level of purity can impact domains such as radar systems, telecommunications and time-frequency metrology. The measurement methods developed here can benefit the characterization of a broad range of signals.

Overlay improvement methods with diffraction based overlay and integrated metrology

NASA Astrophysics Data System (ADS)

Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan

2015-03-01

To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

Theory-based metrological traceability in education: A reading measurement network.

PubMed

Fisher, William P; Stenner, A Jackson

2016-10-01

Huge resources are invested in metrology and standards in the natural sciences, engineering, and across a wide range of commercial technologies. Significant positive returns of human, social, environmental, and economic value on these investments have been sustained for decades. Proven methods for calibrating test and survey instruments in linear units are readily available, as are data- and theory-based methods for equating those instruments to a shared unit. Using these methods, metrological traceability is obtained in a variety of commercially available elementary and secondary English and Spanish language reading education programs in the U.S., Canada, Mexico, and Australia. Given established historical patterns, widespread routine reproduction of predicted text-based and instructional effects expressed in a common language and shared frame of reference may lead to significant developments in theory and practice. Opportunities for systematic implementations of teacher-driven lean thinking and continuous quality improvement methods may be of particular interest and value.

CAVE: the design of a precision metrology instrument for studying performance of KDP crystals

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hibbard, R.L., LLNL

1998-03-30

A device has been developed to measure the frequency conversion performance of large aperture potassium dihydrogen phosphate (KDP) crystals. Third harmonic generation using ICDP is critical to the function of the National Ignition Facility (NIF) laser. The crystals in the converter can be angularly or thermally tuned but are subject to larger aperture inhomogeneities that are functions of growth manufacturing and - mounting. The CAVE (Crystal Alignment Verification Equipment) instrument scans the crystals in a thermally and mechanically controlled environment to determine the local peak tuning angles. The CAVE can then estimate the optimum tuning angle and conversion efficiency overmore » the entire aperture. Coupled with other metrology techniques, the CAVE will help determine which crystal life-cycle components most affect harmonic conversion.« less

Time activities at the BIPM

NASA Technical Reports Server (NTRS)

Thomas, Claudine

1995-01-01

The generation and dissemination of International Atomic Time, TAI, and of Coordinated Universal Time, UTC, are explicitly mentioned in the list of the principal tasks of the BIPM, recalled in the Comptes Rendus of the 18th Conference Generale des Poids et Mesures, in 1987. These tasks are fulfilled by the BIPM Time Section, thanks to international cooperation with national timing centers, which maintain, under metrological conditions, the clocks used to generate TAI. Besides the current work of data collection and processing, research activities are carried out in order to adapt the computation of TAI to the most recent improvements occurring in the time and frequency domains. Studies concerning the application of general relativity and pulsar timing to time metrology are also actively pursued. This paper summarizes the work done in all these fields and outlines future projects.

Two-stage system based on a software-defined radio for stabilizing of optical frequency combs in long-term experiments.

PubMed

Cížek, Martin; Hucl, Václav; Hrabina, Jan; Smíd, Radek; Mikel, Břetislav; Lazar, Josef; Cíp, Ondřej

2014-01-20

A passive optical resonator is a special sensor used for measurement of lengths on the nanometer and sub-nanometer scale. A stabilized optical frequency comb can provide an ultimate reference for measuring the wavelength of a tunable laser locked to the optical resonator. If we lock the repetition and offset frequencies of the comb to a high-grade radiofrequency (RF) oscillator its relative frequency stability is transferred from the RF to the optical frequency domain. Experiments in the field of precise length metrology of low-expansion materials are usually of long-term nature so it is required that the optical frequency comb stay in operation for an extended period of time. The optoelectronic closed-loop systems used for stabilization of combs are usually based on traditional analog electronic circuits processing signals from photodetectors. From an experimental point of view, these setups are very complicated and sensitive to ambient conditions, especially in the optical part, therefore maintaining long-time operation is not easy. The research presented in this paper deals with a novel approach based on digital signal processing and a software-defined radio. We describe digital signal processing algorithms intended for keeping the femtosecond optical comb in a long-time stable operation. This need arose during specialized experiments involving measurements of optical frequencies of tunable continuous-wave lasers. The resulting system is capable of keeping the comb in lock for an extensive period of time (8 days or more) with the relative stability better than 1.6 × 10(-11).

Two-Stage System Based on a Software-Defined Radio for Stabilizing of Optical Frequency Combs in Long-Term Experiments

PubMed Central

Čížek, Martin; Hucl, Václav; Hrabina, Jan; Šmíd, Radek; Mikel, Břetislav; Lazar, Josef; Číp, Ondřej

2014-01-01

A passive optical resonator is a special sensor used for measurement of lengths on the nanometer and sub-nanometer scale. Astabilized optical frequency comb can provide an ultimate reference for measuring the wavelength of a tunable laser locked to the optical resonator. If we lock the repetition and offset frequencies of the comb to a high-grade radiofrequency (RF) oscillator its relative frequency stability is transferred from the RF to the optical frequency domain. Experiments in the field of precise length metrology of low-expansion materials are usually of long-term nature so it is required that the optical frequency comb stay in operation for an extended period of time. The optoelectronic closed-loop systems used for stabilization of combs are usually based on traditional analog electronic circuits processing signals from photodetectors. From an experimental point of view, these setups are very complicated and sensitive to ambient conditions, especially in the optical part, therefore maintaining long-time operation is not easy. The research presented in this paper deals with a novel approach based on digital signal processing and a software-defined radio. We describe digital signal processing algorithms intended for keeping the femtosecond optical comb in a long-time stable operation. This need arose during specialized experiments involving measurements of optical frequencies of tunable continuous-wave lasers. The resulting system is capable of keeping the comb in lock for an extensive period of time (8 days or more) with the relative stability better than 1.6 × 10−11. PMID:24448169

Diffraction based overlay re-assessed

NASA Astrophysics Data System (ADS)

Leray, Philippe; Laidler, David; D'havé, Koen; Cheng, Shaunee

2011-03-01

In recent years, numerous authors have reported the advantages of Diffraction Based Overlay (DBO) over Image Based Overlay (IBO), mainly by comparison of metrology figures of merit such as TIS and TMU. Some have even gone as far as to say that DBO is the only viable overlay metrology technique for advanced technology nodes; 22nm and beyond. Typically the only reported drawback of DBO is the size of the required targets. This severely limits its effective use, when all critical layers of a product, including double patterned layers need to be measured, and in-die overlay measurements are required. In this paper we ask whether target size is the only limitation to the adoption of DBO for overlay characterization and control, or are there other metrics, which need to be considered. For example, overlay accuracy with respect to scanner baseline or on-product process overlay control? In this work, we critically re-assess the strengths and weaknesses of DBO for the applications of scanner baseline and on-product process layer overlay control. A comprehensive comparison is made to IBO. For on product process layer control we compare the performance on critical process layers; Gate, Contact and Metal. In particularly we focus on the response of the scanner to the corrections determined by each metrology technique for each process layer, as a measure of the accuracy. Our results show that to characterize an overlay metrology technique that is suitable for use in advanced technology nodes requires much more than just evaluating the conventional metrology metrics of TIS and TMU.

Overlay metrology for double patterning processes

NASA Astrophysics Data System (ADS)

Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

2009-03-01

The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double patterning processes.

Electromagnetic characterization of advanced nanostructured materials and multilayer design optimization for metrological and low radar observability applications

NASA Astrophysics Data System (ADS)

Micheli, Davide; Pastore, Roberto; Delfini, Andrea; Giusti, Alfonso; Vricella, Antonio; Santoni, Fabio; Marchetti, Mario; Tolochko, Oleg; Vasilyeva, Ekaterina

2017-05-01

In this work the electromagnetic characterization of composite materials reinforced with carbon and metallic nanoparticles is presented. In particular, the electric permittivity and the magnetic permeability as a function of the frequency are used to evaluate the electromagnetic absorption capability of the nanocomposites. The aim is the study of possible applications in advanced coating able to tune the electromagnetic reflectivity of satellite surfaces in specific frequency ranges, in a special way for those surfaces that for some reason could be exposed to the antenna radiation pattern. In fact, the interference caused by the spurious electromagnetic multipath due to good electric conductive satellite surface components could in turn affect the main radiation lobe of TLC and Telemetry antennas, thus modifying its main propagation directions and finally increasing the microwave channel pathloss. The work reports the analysis of different nanostructured materials in the 2-10 GHz frequency range. The employed nanopowders are of carbon nanotubes, cobalt, argent, titanium, nickel, zinc, copper, iron, boron, bismuth, hafnium, in different weight percentages versus the hosting polymeric matrix. The materials are classified as a function of their electromagnetic losses capability by taking into account of both electric and magnetic properties. The possibility to design multi-layered structures optimized to provide specific microwave response is finally analyzed by the aid of swam intelligence algorithm. This novel technique is in general interesting for metrological purpose and remote sensing purposes, and can be effectively used in aerospace field for frequency selective materials design, in order to reduce the aircraft/spacecraft radar observability at certain frequencies.

Frequency and amplitude modulation of ultra-compact terahertz quantum cascade lasers using an integrated avalanche diode oscillator.

PubMed

Castellano, Fabrizio; Li, Lianhe; Linfield, Edmund H; Davies, A Giles; Vitiello, Miriam S

2016-03-15

Mode-locked comb sources operating at optical frequencies underpin applications ranging from spectroscopy and ultrafast physics, through to absolute frequency measurements and atomic clocks. Extending their operation into the terahertz frequency range would greatly benefit from the availability of compact semiconductor-based sources. However, the development of any compact mode-locked THz laser, which itself is inherently a frequency comb, has yet to be achieved without the use of an external stimulus. High-power, electrically pumped quantum cascade lasers (QCLs) have recently emerged as a promising solution, owing to their octave spanning bandwidths, the ability to achieve group-velocity dispersion compensation and the possibility of obtaining active mode-locking. Here, we propose an unprecedented compact architecture to induce both frequency and amplitude self-modulation in a THz QCL. By engineering a microwave avalanche oscillator into the laser cavity, which provides a 10 GHz self-modulation of the bias current and output power, we demonstrate multimode laser emission centered around 3 THz, with distinct multiple sidebands. The resulting microwave amplitude and frequency self-modulation of THz QCLs opens up intriguing perspectives, for engineering integrated self-mode-locked THz lasers, with impact in fields such as nano- and ultrafast photonics and optical metrology.

Frequency and amplitude modulation of ultra-compact terahertz quantum cascade lasers using an integrated avalanche diode oscillator

PubMed Central

Castellano, Fabrizio; Li, Lianhe; Linfield, Edmund H.; Davies, A. Giles; Vitiello, Miriam S.

2016-01-01

Mode-locked comb sources operating at optical frequencies underpin applications ranging from spectroscopy and ultrafast physics, through to absolute frequency measurements and atomic clocks. Extending their operation into the terahertz frequency range would greatly benefit from the availability of compact semiconductor-based sources. However, the development of any compact mode-locked THz laser, which itself is inherently a frequency comb, has yet to be achieved without the use of an external stimulus. High-power, electrically pumped quantum cascade lasers (QCLs) have recently emerged as a promising solution, owing to their octave spanning bandwidths, the ability to achieve group-velocity dispersion compensation and the possibility of obtaining active mode-locking. Here, we propose an unprecedented compact architecture to induce both frequency and amplitude self-modulation in a THz QCL. By engineering a microwave avalanche oscillator into the laser cavity, which provides a 10 GHz self-modulation of the bias current and output power, we demonstrate multimode laser emission centered around 3 THz, with distinct multiple sidebands. The resulting microwave amplitude and frequency self-modulation of THz QCLs opens up intriguing perspectives, for engineering integrated self-mode-locked THz lasers, with impact in fields such as nano- and ultrafast photonics and optical metrology. PMID:26976199

Optical frequency stabilization in infrared region using improved dual feed-back loop

NASA Astrophysics Data System (ADS)

Ružička, B.; Číp, O.; Lazar, J.

2007-03-01

Modern technologies such as DWDM (Dense Wavelength Division Multiplex) need precise stability of laser frequencies. According to this fact, requirements of new etalons of optical frequencies in the telecommunication band is rapidly growing. Lasers working in near infrared telecommunication band (1500-1600 nm) can be stabilized to 12C IIH II or 13C IIH II (acetylene) gas absorption lines. The acetylene gas absorption has been widely studied and accepted by international bodies of standardization as a primary wavelength reference in the near infrared band around 1550 nm. Our aim was to design and develop a compact fibre optics laser system generating coherent light in near-IR band with high frequency stability (at least 1.10 -8). This system should become a base for realization of a primary frequency standard for optical communications in the Czech Republic. Such an etalon will be needed for calibration of wavelengthmeters and spectral analysers for DWDM communication systems. We are co-operating with CMI (Czech Metrology Institute) on this project. We present stabilized laser system based on a single frequency DFB (Distributed Feedback) laser diode with a narrow spectral profile. The laser is pre-stabilized by means of the FM-spectroscopy on a passive resonator. Thanks to a fast feed-back loop we are able to improve spectral characteristics of the laser. The laser frequency is locked by a relatively slow second feed-back loop on an absorption line of acetylene vapour which is sealed in a cell under the optimised pressure.

A heterodyne interferometer for high-performance industrial metrology

NASA Astrophysics Data System (ADS)

Schuldt, Thilo; Gohlke, Martin; Weise, Dennis; Johann, Ulrich; Peters, Achim; Braxmaier, Claus

2008-11-01

We developed a compact, fiber-coupled heterodyne interferometer for translation and tilt metrology. Noise levels below 5 pm/√Hz in translation and below 10 nrad/√Hz in tilt measurement, both for frequencies above 10-2 Hz, were demonstrated in lab experiments. While this setup was developed with respect to the LISA (Laser Interferometer Space Antenna) space mission current activities focus on its adaptation for dimensional characterization of ultra-stable materials and industrial metrology. The interferometer is used in high-accuracy dilatometry measuring the coefficient of thermal expansion (CTE) of dimensionally highly stable materials such as carbon-fiber reinforced plastic (CFRP) and Zerodur. The facility offers the possibility to measure the CTE with an accuracy better 10-8/K. We also develop a very compact and quasi-monolithic sensor head utilizing ultra-low expansion glass material which is the basis for a future space-qualifiable interferometer setup and serves as a prototype for a sensor head used in industrial environment. For high resolution 3D profilometry and surface property measurements (i. e. roughness, evenness and roundness), a low-noise (<=1nm/√ Hz) actuator will be implemented which enables a scan of the measurement beam over the surface under investigation.

Call for papers for special issue of Journal of Molecular Spectroscopy focusing on "Frequency-comb spectroscopy"

NASA Astrophysics Data System (ADS)

Foltynowicz, Aleksandra; Picqué, Nathalie; Ye, Jun

2018-05-01

Frequency combs are becoming enabling tools for many applications in science and technology, beyond the original purpose of frequency metrology of simple atoms. The precisely evenly spaced narrow lines of a laser frequency comb inspire intriguing approaches to molecular spectroscopy, designed and implemented by a growing community of scientists. Frequency-comb spectroscopy advances the frontiers of molecular physics across the entire electro-magnetic spectrum. Used as frequency rulers, frequency combs enable absolute frequency measurements and precise line shape studies of molecular transitions, for e.g. tests of fundamental physics and improved determination of fundamental constants. As light sources interrogating the molecular samples, they dramatically improve the resolution, precision, sensitivity and acquisition time of broad spectral-bandwidth spectroscopy and open up new opportunities and applications at the leading edge of molecular spectroscopy and sensing.

Optical truss and retroreflector modeling for picometer laser metrology

NASA Astrophysics Data System (ADS)

Hines, Braden E.

1993-09-01

Space-based astrometric interferometer concepts typically have a requirement for the measurement of the internal dimensions of the instrument to accuracies in the picometer range. While this level of resolution has already been achieved for certain special types of laser gauges, techniques for picometer-level accuracy need to be developed to enable all the various kinds of laser gauges needed for space-based interferometers. Systematic errors due to retroreflector imperfections become important as soon as the retroreflector is allowed to either translate in position or articulate in angle away from its nominal zero-point. Also, when combining several laser interferometers to form a three-dimensional laser gauge (a laser optical truss), systematic errors due to imperfect knowledge of the truss geometry are important as the retroreflector translates away from its nominal zero-point. In order to assess the astrometric performance of a proposed instrument, it is necessary to determine how the effects of an imperfect laser metrology system impact the astrometric accuracy. This paper show the development of an error propagation model from errors in the 1-D metrology measurements through the impact on the overall astrometric accuracy for OSI. Simulations are then presented based on this development which were used to define a multiplier which determines the 1-D metrology accuracy required to produce a given amount of fringe position error.

Picometre and nanoradian heterodyne interferometry and its application in dilatometry and surface metrology

NASA Astrophysics Data System (ADS)

Schuldt, T.; Gohlke, M.; Kögel, H.; Spannagel, R.; Peters, A.; Johann, U.; Weise, D.; Braxmaier, C.

2012-05-01

A high-sensitivity heterodyne interferometer implementing differential wavefront sensing for tilt measurement was developed over the last few years. With this setup, using an aluminium breadboard and compact optical mounts with a beam height of 2 cm, noise levels less than 5 pm Hz-1/2 in translation and less than 10 nrad Hz-1/2 in tilt measurement, both for frequencies above 10-2 Hz, have been demonstrated. Here, a new, compact and ruggedized interferometer setup utilizing a baseplate made of Zerodur, a thermally and mechanically highly stable glass ceramic with a coefficient of thermal expansion (CTE) of 2 × 10-8 K-1, is presented. The optical components are fixed to the baseplate using a specifically developed, easy-to-handle, assembly-integration technology based on a space-qualified two-component epoxy. While developed as a prototype for future applications aboard satellite space missions (such as Laser Interferometer Space Antenna), the interferometer is used in laboratory experiments for dilatometry and surface metrology. A first dilatometer setup with a demonstrated accuracy of 10-7 K-1 in CTE measurement was realized. As it was seen that the accuracy is limited by the dimensional stability of the sample tube support, a new setup was developed utilizing Zerodur as structural material for the sample tube support. In another activity, the interferometer is used for characterization of high-quality mirror surfaces at the picometre level and for high-accuracy two-dimensional surface characterization in a prototype for industrial applications. In this paper, the corresponding designs, their realizations and first measurements of both applications in dilatometry and surface metrology are presented.

Exploring the Frequency Stability Limits of Whispering Gallery Mode Resonators for Metrological Applications

NASA Technical Reports Server (NTRS)

Chembo, Yanne K.; Baumgartel, Lukas; Grudinin, Ivan; Strekalov, Dmitry; Thompson, Robert; Yu, Nan

2012-01-01

Whispering gallery mode resonators are attracting increasing interest as promising frequency reference cavities. Unlike commonly used Fabry-Perot cavities, however, they are filled with a bulk medium whose properties have a significant impact on the stability of its resonance frequencies. In this context that has to be reduced to a minimum. On the other hand, a small monolithic resonator provides opportunity for better stability against vibration and acceleration. this feature is essential when the cavity operates in a non-laboratory environment. In this paper, we report a case study for a crystalline resonator, and discuss the a pathway towards the inhibition of vibration-and acceleration-induced frequency fluctuations.

Colloquium: Strong-field phenomena in periodic systems

NASA Astrophysics Data System (ADS)

Kruchinin, Stanislav Yu.; Krausz, Ferenc; Yakovlev, Vladislav S.

2018-04-01

The advent of visible-infrared laser pulses carrying a substantial fraction of their energy in a single field oscillation cycle has opened a new era in the experimental investigation of ultrafast processes in semiconductors and dielectrics (bulk as well as nanostructured), motivated by the quest for the ultimate frontiers of electron-based signal metrology and processing. Exploring ways to approach those frontiers requires insight into the physics underlying the interaction of strong high-frequency (optical) fields with electrons moving in periodic potentials. This Colloquium aims at providing this insight. Introduction to the foundations of strong-field phenomena defines and compares regimes of field-matter interaction in periodic systems, including (perfect) crystals as well as optical and semiconductor superlattices, followed by a review of recent experimental advances in the study of strong-field dynamics in crystals and nanostructures. Avenues toward measuring and controlling electronic processes up to petahertz frequencies are discussed.

Optical Atomic Clock for Fundamental Physics and Precision Metrology in Space

NASA Astrophysics Data System (ADS)

Williams, Jason; Le, Thanh; Kulas, Sascha; Yu, Nan

2017-04-01

The maturity of optical atomic clocks (OC), which operate at optical frequencies for higher quality-factor as compared to their microwave counterparts, has rapidly progressed to the point where lab-based systems now outperform the record cesium clocks by orders of magnitude in both accuracy and stability. We will present our efforts to develop a strontium optical clock testbed at JPL, aimed towards extending the exceptional performance demonstrated by OCs from state-of-the-art laboratory designs to a transportable instrument that can fit within the space and power constraints of e.g. a single express rack onboard the International Space Station. The overall technology will find applications for future fundamental physics research, both on ground and in space, precision time keeping, and NASA/JPL time and frequency test capabilities. This research was carried out at the Jet Propulsion Laboratory, California Institute of Technology, under a contract with the National Aeronautics and Space Administration.

Technique for long and absolute distance measurement based on laser pulse repetition frequency sweeping

NASA Astrophysics Data System (ADS)

Castro Alves, D.; Abreu, Manuel; Cabral, A.; Jost, Michael; Rebordão, J. M.

2017-11-01

In this work we present a technique to perform long and absolute distance measurements based on mode-locked diode lasers. Using a Michelson interferometer, it is possible to produce an optical cross-correlation between laser pulses of the reference arm with the pulses from the measurement arm, adjusting externally their degree of overlap either changing the pulse repetition frequency (PRF) or the position of the reference arm mirror for two (or more) fixed frequencies. The correlation of the travelling pulses for precision distance measurements relies on ultra-short pulse durations, as the uncertainty associated to the method is dependent on the laser pulse width as well as on a highly stable PRF. Mode-locked Diode lasers are a very appealing technology for its inherent characteristics, associated to compactness, size and efficiency, constituting a positive trade-off with regard to other mode-locked laser sources. Nevertheless, main current drawback is the non-availability of frequency-stable laser diodes. The laser used is a monolithic mode-locked semiconductor quantum-dot (QD) laser. The laser PRF is locked to an external stabilized RF reference. In this work we will present some of the preliminary results and discuss the importance of the requirements related to laser PRF stability in the final metrology system accuracy.

Calibration of Galileo signals for time metrology.

PubMed

Defraigne, Pascale; Aerts, Wim; Cerretto, Giancarlo; Cantoni, Elena; Sleewaegen, Jean-Marie

2014-12-01

Using global navigation satellite system (GNSS) signals for accurate timing and time transfer requires the knowledge of all electric delays of the signals inside the receiving system. GNSS stations dedicated to timing or time transfer are classically calibrated only for Global Positioning System (GPS) signals. This paper proposes a procedure to determine the hardware delays of a GNSS receiving station for Galileo signals, once the delays of the GPS signals are known. This approach makes use of the broadcast satellite inter-signal biases, and is based on the ionospheric delay measured from dual-frequency combinations of GPS and Galileo signals. The uncertainty on the so-determined hardware delays is estimated to 3.7 ns for each isolated code in the L5 frequency band, and 4.2 ns for the ionosphere-free combination of E1 with a code of the L5 frequency band. For the calibration of a time transfer link between two stations, another approach can be used, based on the difference between the common-view time transfer results obtained with calibrated GPS data and with uncalibrated Galileo data. It is shown that the results obtained with this approach or with the ionospheric method are equivalent.

[Metrological analysis of measuring systems in testing an anticipatory reaction to the position of a moving object].

PubMed

Aksiuta, E F; Ostashev, A V; Sergeev, E V; Aksiuta, V E

1997-01-01

The methods of the information (entropy) error theory were used to make a metrological analysis of the well-known commercial measuring systems for timing an anticipative reaction (AR) to the position of a moving object, which is based on the electromechanical, gas-discharge, and electron principles. The required accuracy of measurement was ascertained to be achieved only by using the systems based on the electron principle of moving object simulation and AR measurement.

Quantum Communications Systems

DTIC Science & Technology

2012-09-21

metrology practical. The strategy was to develop robust photonic quantum states and sensors serving as an archetype for loss-tolerant information...communications and metrology. Our strategy consisted of developing robust photonic quantum states and sensors serving as an archetype for loss-tolerant...developed atomic memories in caesium vapour, based on a stimulated Raman transition, that have demonstrated a TBP greater than 1000 and are uniquely suited

High Precision Laser Range Sensor

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge (Inventor); Lay, Oliver P. (Inventor)

2003-01-01

The present invention is an improved distance measuring interferometer that includes high speed phase modulators and additional phase meters to generate and analyze multiple heterodyne signal pairs with distinct frequencies. Modulation sidebands with large frequency separation are generated by the high speed electro-optic phase modulators, requiring only a single frequency stable laser source and eliminating the need for a fist laser to be tuned or stabilized relative to a second laser. The combination of signals produced by the modulated sidebands is separated and processed to give the target distance. The resulting metrology apparatus enables a sensor with submicron accuracy or better over a multi- kilometer ambiguity range.

Frequency metrology of the acetylene lines near 789 nm from lamb-dip measurements

NASA Astrophysics Data System (ADS)

Tao, Lei-Gang; Hua, Tian-Peng; Sun, Yu R.; Wang, Jin; Liu, An-Wen; Hu, Shui-Ming

2018-05-01

Lamb-dips of the ro-vibrational lines of 12C2H2 near 789 nm were recorded using cavity ring-down saturation spectroscopy. Calibrated by an optical frequency comb, frequencies of 45 acetylene lines were determined with an accuracy of 1.1 ×10-7 cm-1 (δν / ν = 8 ×10-12), which is over two orders of magnitude more accurate than previous Doppler-limited studies. An averaged shift of about 0.01 cm-1 were found by comparing the upper energies obtained in this work to those recently presented by Chubb et al. from a MARVEL analysis.

Spectral and temporal characterization of a fused-quartz-microresonator optical frequency comb

DOE Office of Scientific and Technical Information (OSTI.GOV)

Papp, Scott B.; Diddams, Scott A.

2011-11-15

We report on the fabrication of high-Q, fused-quartz microresonators and the parametric generation of a frequency comb with 36-GHz line spacing using them. We have characterized the intrinsic stability of the comb in both the time and frequency domains to assess its suitability for future precision metrology applications. Intensity autocorrelation measurements and line-by-line comb control reveal near-transform-limited picosecond pulse trains that are associated with good relative phase and amplitude stability of the comb lines. The comb's 36-GHz line spacing can be readily photodetected, which enables measurements of its intrinsic and absolute phase fluctuations.

Clean focus, dose and CD metrology for CD uniformity improvement

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Kim, Nakyoon; Robinson, John C.; Mengel, Markus; Pablo, Rovira; Yoo, Sungchul; Getin, Raphael; Choi, Dongsub; Jeon, Sanghuck

2018-03-01

Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) uniformity requires continuous improvement to meet the required CD error budget. In this study we investigate using optical measurement technology to improve over CD-SEM methods in focus, dose, and CD. One of the key challenges is measuring scanner focus of device patterns. There are focus measurement methods based on specially designed marks on scribe-line, however, one issue of this approach is that it will report focus of scribe line which is potentially different from that of the real device pattern. In addition, scribe-line marks require additional design and troubleshooting steps that add complexity. In this study, we investigated focus measurement directly on the device pattern. Dose control is typically based on using the linear correlation behavior between dose and CD. The noise of CD measurement, based on CD-SEM for example, will not only impact the accuracy, but also will make it difficult to monitor dose signature on product wafers. In this study we will report the direct dose metrology result using an optical metrology system which especially enhances the DUV spectral coverage to improve the signal to noise ratio. CD-SEM is often used to measure CD after the lithography step. This measurement approach has the advantage of easy recipe setup as well as the flexibility to measure critical feature dimensions, however, we observe that CD-SEM metrology has limitations. In this study, we demonstrate within-field CD uniformity improvement through the extraction of clean scanner slit and scan CD behavior by using optical metrology.

Deep machine learning based Image classification in hard disk drive manufacturing (Conference Presentation)

NASA Astrophysics Data System (ADS)

Rana, Narender; Chien, Chester

2018-03-01

A key sensor element in a Hard Disk Drive (HDD) is the read-write head device. The device is complex 3D shape and its fabrication requires over thousand process steps with many of them being various types of image inspection and critical dimension (CD) metrology steps. In order to have high yield of devices across a wafer, very tight inspection and metrology specifications are implemented. Many images are collected on a wafer and inspected for various types of defects and in CD metrology the quality of image impacts the CD measurements. Metrology noise need to be minimized in CD metrology to get better estimate of the process related variations for implementing robust process controls. Though there are specialized tools available for defect inspection and review allowing classification and statistics. However, due to unavailability of such advanced tools or other reasons, many times images need to be manually inspected. SEM Image inspection and CD-SEM metrology tools are different tools differing in software as well. SEM Image inspection and CD-SEM metrology tools are separate tools differing in software and purpose. There have been cases where a significant numbers of CD-SEM images are blurred or have some artefact and there is a need for image inspection along with the CD measurement. Tool may not report a practical metric highlighting the quality of image. Not filtering CD from these blurred images will add metrology noise to the CD measurement. An image classifier can be helpful here for filtering such data. This paper presents the use of artificial intelligence in classifying the SEM images. Deep machine learning is used to train a neural network which is then used to classify the new images as blurred and not blurred. Figure 1 shows the image blur artefact and contingency table of classification results from the trained deep neural network. Prediction accuracy of 94.9 % was achieved in the first model. Paper covers other such applications of the deep neural network in image classification for inspection, review and metrology.

Ionospheric signatures of Lightning

NASA Astrophysics Data System (ADS)

Hsu, M.; Liu, J.

2003-12-01

The geostationary metrology satellite (GMS) monitors motions of thunderstorm cloud, while the lightning detection network (LDN) in Taiwan and the very high Frequency (VHF) radar in Chung-Li (25.0›XN, 121.2›XE) observed occurrences of lightning during May and July, 1997. Measurements from the digisonde portable sounder (DPS) at National Central University shows that lightning results in occurrence of the sporadic E-layer (Es), as well as increase and decrease of plasma density at the F2-peak and E-peak in the ionosphere, respectively. A network of ground-based GPS receivers is further used to monitor the spatial distribution of the ionospheric TEC. To explain the plasma density variations, a model is proposed.

Error Modeling of Multi-baseline Optical Truss. Part II; Application to SIM Metrology Truss Field Dependent Error

NASA Technical Reports Server (NTRS)

Zhang, Liwei Dennis; Milman, Mark; Korechoff, Robert

2004-01-01

The current design of the Space Interferometry Mission (SIM) employs a 19 laser-metrology-beam system (also called L19 external metrology truss) to monitor changes of distances between the fiducials of the flight system's multiple baselines. The function of the external metrology truss is to aid in the determination of the time-variations of the interferometer baseline. The largest contributor to truss error occurs in SIM wide-angle observations when the articulation of the siderostat mirrors (in order to gather starlight from different sky coordinates) brings to light systematic errors due to offsets at levels of instrument components (which include comer cube retro-reflectors, etc.). This error is labeled external metrology wide-angle field-dependent error. Physics-based model of field-dependent error at single metrology gauge level is developed and linearly propagated to errors in interferometer delay. In this manner delay error sensitivity to various error parameters or their combination can be studied using eigenvalue/eigenvector analysis. Also validation of physics-based field-dependent model on SIM testbed lends support to the present approach. As a first example, dihedral error model is developed for the comer cubes (CC) attached to the siderostat mirrors. Then the delay errors due to this effect can be characterized using the eigenvectors of composite CC dihedral error. The essence of the linear error model is contained in an error-mapping matrix. A corresponding Zernike component matrix approach is developed in parallel, first for convenience of describing the RMS of errors across the field-of-regard (FOR), and second for convenience of combining with additional models. Average and worst case residual errors are computed when various orders of field-dependent terms are removed from the delay error. Results of the residual errors are important in arriving at external metrology system component requirements. Double CCs with ideally co-incident vertices reside with the siderostat. The non-common vertex error (NCVE) is treated as a second example. Finally combination of models, and various other errors are discussed.

Extended phase matching of second-harmonic generation in periodically poled KTiOPO4 with zero group-velocity mismatch

NASA Astrophysics Data System (ADS)

König, Friedrich; Wong, Franco N. C.

2004-03-01

Under extended phase-matching conditions, the first frequency derivative of the wave-vector mismatch is zero and the phase-matching bandwidth is greatly increased. We present extensive three-wave mixing measurements of the wave-vector mismatch and obtain improved Sellmeier equations for KTiOPO4. We observed a type-II extended phase-matching bandwidth of 100 nm for second-harmonic generation in periodically poled KTiOPO4, centered at the fundamental wavelength of 1584 nm. Applications in quantum entanglement and frequency metrology are discussed.

High power laser source for atom cooling based on reliable telecoms technology with all fibre frequency stabilisation

NASA Astrophysics Data System (ADS)

Legg, Thomas; Farries, Mark

2017-02-01

Cold atom interferometers are emerging as important tools for metrology. Designed into gravimeters they can measure extremely small changes in the local gravitational field strength and be used for underground surveying to detect buried utilities, mineshafts and sinkholes prior to civil works. To create a cold atom interferometer narrow linewidth, frequency stabilised lasers are required to cool the atoms and to setup and measure the atom interferometer. These lasers are commonly either GaAs diodes, Ti Sapphire lasers or frequency doubled InGaAsP diodes and fibre lasers. The InGaAsP DFB lasers are attractive because they are very reliable, mass-produced, frequency controlled by injection current and simply amplified to high powers with fibre amplifiers. In this paper a laser system suitable for Rb atom cooling, based on a 1560nm DFB laser and erbium doped fibre amplifier, is described. The laser output is frequency doubled with fibre coupled periodically poled LiNbO3 to a wavelength of 780nm. The output power exceeds 1 W at 780nm. The laser is stabilised at 1560nm against a fibre Bragg resonator that is passively temperature compensated. Frequency tuning over a range of 1 GHz is achieved by locking the laser to sidebands of the resonator that are generated by a phase modulator. This laser design is attractive for field deployable rugged systems because it uses all fibre coupled components with long term proven reliability.

Method and system for processing optical elements using magnetorheological finishing

DOEpatents

Menapace, Joseph Arthur; Schaffers, Kathleen Irene; Bayramian, Andrew James; Molander, William A

2012-09-18

A method of finishing an optical element includes mounting the optical element in an optical mount having a plurality of fiducials overlapping with the optical element and obtaining a first metrology map for the optical element and the plurality of fiducials. The method also includes obtaining a second metrology map for the optical element without the plurality of fiducials, forming a difference map between the first metrology map and the second metrology map, and aligning the first metrology map and the second metrology map. The method further includes placing mathematical fiducials onto the second metrology map using the difference map to form a third metrology map and associating the third metrology map to the optical element. Moreover, the method includes mounting the optical element in the fixture in an MRF tool, positioning the optical element in the fixture; removing the plurality of fiducials, and finishing the optical element.

Laser and Optical Fiber Metrology in Romania

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sporea, Dan; Sporea, Adelina

2008-04-15

The Romanian government established in the last five years a National Program for the improvement of country's infrastructure of metrology. The set goal was to develop and accredit testing and calibration laboratories, as well as certification bodies, according to the ISO 17025:2005 norm. Our Institute benefited from this policy, and developed a laboratory for laser and optical fibers metrology in order to provide testing and calibration services for the certification of laser-based industrial, medical and communication products. The paper will present the laboratory accredited facilities and some of the results obtained in the evaluation of irradiation effects of optical andmore » optoelectronic parts, tests run under the EU's Fusion Program.« less

Green analytical chemistry introduction to chloropropanols determination at no economic and analytical performance costs?

PubMed

Jędrkiewicz, Renata; Orłowski, Aleksander; Namieśnik, Jacek; Tobiszewski, Marek

2016-01-15

In this study we perform ranking of analytical procedures for 3-monochloropropane-1,2-diol determination in soy sauces by PROMETHEE method. Multicriteria decision analysis was performed for three different scenarios - metrological, economic and environmental, by application of different weights to decision making criteria. All three scenarios indicate capillary electrophoresis-based procedure as the most preferable. Apart from that the details of ranking results differ for these three scenarios. The second run of rankings was done for scenarios that include metrological, economic and environmental criteria only, neglecting others. These results show that green analytical chemistry-based selection correlates with economic, while there is no correlation with metrological ones. This is an implication that green analytical chemistry can be brought into laboratories without analytical performance costs and it is even supported by economic reasons. Copyright © 2015 Elsevier B.V. All rights reserved.

Mathematical calibration procedure of a capacitive sensor-based indexed metrology platform

NASA Astrophysics Data System (ADS)

Brau-Avila, A.; Santolaria, J.; Acero, R.; Valenzuela-Galvan, M.; Herrera-Jimenez, V. M.; Aguilar, J. J.

2017-03-01

The demand for faster and more reliable measuring tasks for the control and quality assurance of modern production systems has created new challenges for the field of coordinate metrology. Thus, the search for new solutions in coordinate metrology systems and the need for the development of existing ones still persists. One example of such a system is the portable coordinate measuring machine (PCMM), the use of which in industry has considerably increased in recent years, mostly due to its flexibility for accomplishing in-line measuring tasks as well as its reduced cost and operational advantages compared to traditional coordinate measuring machines. Nevertheless, PCMMs have a significant drawback derived from the techniques applied in the verification and optimization procedures of their kinematic parameters. These techniques are based on the capture of data with the measuring instrument from a calibrated gauge object, fixed successively in various positions so that most of the instrument measuring volume is covered, which results in time-consuming, tedious and expensive verification and optimization procedures. In this work the mathematical calibration procedure of a capacitive sensor-based indexed metrology platform (IMP) is presented. This calibration procedure is based on the readings and geometric features of six capacitive sensors and their targets with nanometer resolution. The final goal of the IMP calibration procedure is to optimize the geometric features of the capacitive sensors and their targets in order to use the optimized data in the verification procedures of PCMMs.

Enabling Quantitative Optical Imaging for In-die-capable Critical Dimension Targets

PubMed Central

Barnes, B.M.; Henn, M.-A.; Sohn, M. Y.; Zhou, H.; Silver, R. M.

2017-01-01

Dimensional scaling trends will eventually bring semiconductor critical dimensions (CDs) down to only a few atoms in width. New optical techniques are required to address the measurement and variability for these CDs using sufficiently small in-die metrology targets. Recently, Qin et al. [Light Sci Appl, 5, e16038 (2016)] demonstrated quantitative model-based measurements of finite sets of lines with features as small as 16 nm using 450 nm wavelength light. This paper uses simulation studies, augmented with experiments at 193 nm wavelength, to adapt and optimize the finite sets of features that work as in-die-capable metrology targets with minimal increases in parametric uncertainty. A finite element based solver for time-harmonic Maxwell's equations yields two- and three-dimensional simulations of the electromagnetic scattering for optimizing the design of such targets as functions of reduced line lengths, fewer number of lines, fewer focal positions, smaller critical dimensions, and shorter illumination wavelength. Metrology targets that exceeded performance requirements are as short as 3 μm for 193 nm light, feature as few as eight lines, and are extensible to sub-10 nm CDs. Target areas measured at 193 nm can be fifteen times smaller in area than current state-of-the-art scatterometry targets described in the literature. This new methodology is demonstrated to be a promising alternative for optical model-based in-die CD metrology. PMID:28757674

High density terahertz frequency comb produced by coherent synchrotron radiation

PubMed Central

Tammaro, S.; Pirali, O.; Roy, P.; Lampin, J.-F.; Ducournau, G.; Cuisset, A.; Hindle, F.; Mouret, G.

2015-01-01

Frequency combs have enabled significant progress in frequency metrology and high-resolution spectroscopy extending the achievable resolution while increasing the signal-to-noise ratio. In its coherent mode, synchrotron radiation is accepted to provide an intense terahertz continuum covering a wide spectral range from about 0.1 to 1 THz. Using a dedicated heterodyne receiver, we reveal the purely discrete nature of this emission. A phase relationship between the light pulses leads to a powerful frequency comb spanning over one decade in frequency. The comb has a mode spacing of 846 kHz, a linewidth of about 200 Hz, a fractional precision of about 2 × 10−10 and no frequency offset. The unprecedented potential of the comb for high-resolution spectroscopy is demonstrated by the accurate determination of pure rotation transitions of acetonitrile. PMID:26190043

[The EFS metrology: From the production to the reason].

PubMed

Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

2014-06-01

In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

Graphene-based quantum Hall resistance standards grown by chemical vapor deposition on silicon carbide

NASA Astrophysics Data System (ADS)

Ribeiro-Palau, Rebeca; Lafont, Fabien; Kazazis, Dimitris; Michon, Adrien; Couturaud, Olivier; Consejo, Christophe; Jouault, Benoit; Poirier, Wilfrid; Schopfer, Felicien

2015-03-01

Replace GaAs-based quantum Hall resistance standards (GaAs-QHRS) by a more convenient one, based on graphene (Gr-QHRS), is an ongoing goal in metrology. The new Gr-QHRS are expected to work in less demanding experimental conditions than GaAs ones. It will open the way to a broad dissemination of quantum standards, potentially towards industrial end-users, and it will support the implementation of a new International System of Units based on fixed fundamental constants. Here, we present accurate quantum Hall resistance measurements in large graphene Hall bars, grown by the hybrid scalable technique of propane/hydrogen chemical vapor deposition (CVD) on silicon carbide (SiC). This new Gr-QHRS shows a relative accuracy of 1 ×10-9 of the Hall resistance under the lowest magnetic field ever achieved in graphene. These experimental conditions surpass those of the most wildely used GaAs-QHRS. These results confirm the promises of graphene for resistance metrology applications and emphasizes the quality of the graphene produced by the CVD on SiC for applications as demanding as the resistance metrology.

Diffraction-based overlay metrology for double patterning technologies

NASA Astrophysics Data System (ADS)

Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

2009-03-01

The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

World wide matching of registration metrology tools of various generations

NASA Astrophysics Data System (ADS)

Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

2008-10-01

Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

Bulk crystalline optomechanics

NASA Astrophysics Data System (ADS)

Renninger, W. H.; Kharel, P.; Behunin, R. O.; Rakich, P. T.

2018-06-01

Control of long-lived, high-frequency phonons using light offers a path towards creating robust quantum links, and could lead to tools for precision metrology with applications to quantum information processing. Optomechanical systems based on bulk acoustic-wave resonators are well suited for this goal in light of their high quality factors, and because they do not suffer from surface interactions as much as their microscale counterparts. However, so far these phonons have been accessible only electromechanically, using piezoelectric interactions. Here, we demonstrate customizable optomechanical coupling to macroscopic phonon modes of a bulk acoustic-wave resonator at cryogenic temperatures. These phonon modes, which are formed by shaping the surfaces of a crystal into a plano-convex phononic resonator, yield appreciable optomechanical coupling rates, providing access to high acoustic quality factors (4.2 × 107) at high phonon frequencies (13 GHz). This simple approach, which uses bulk properties rather than nanostructural control, is appealing for the ability to engineer optomechanical systems at high frequencies that are robust against thermal decoherence. Moreover, we show that this optomechanical system yields a unique form of dispersive symmetry-breaking that enables phonon heating or cooling without an optical cavity.

A coherent fiber link for very long baseline interferometry.

PubMed

Clivati, Cecilia; Costanzo, Giovanni A; Frittelli, Matteo; Levi, Filippo; Mura, Alberto; Zucco, Massimo; Ambrosini, Roberto; Bortolotti, Claudio; Perini, Federico; Roma, Mauro; Calonico, Davide

2015-11-01

We realize a coherent fiber link for application in very long baseline interferometry (VLBI) for radio astronomy and geodesy. A 550-km optical fiber connects the Italian National Metrological Institute (INRIM) to a radio telescope in Italy and is used for the primary Cs fountain clock stability and accuracy dissemination. We use an ultrastable laser frequency- referenced to the primary standard as a transfer oscillator; at the radio telescope, an RF signal is generated from the laser by using an optical frequency comb. This scheme now provides the traceability of the local maser to the SI second, realized by the Cs fountain at the 1.7 × 10(-16) accuracy. The fiber link never limits the experiment and is robust enough to sustain radio astronomical campaigns. This experiment opens the possibility of replacing the local hydrogen masers at the VLBI sites with optically-synthesized RF signals. This could improve VLBI resolution by providing more accurate and stable frequency references and, in perspective, by enabling common- clock VLBI based on a network of telescopes connected by fiber links.

Extremely high-accuracy correction of air refractive index using two-colour optical frequency combs

PubMed Central

Wu, Guanhao; Takahashi, Mayumi; Arai, Kaoru; Inaba, Hajime; Minoshima, Kaoru

2013-01-01

Optical frequency combs have become an essential tool for distance metrology, showing great advantages compared with traditional laser interferometry. However, there is not yet an appropriate method for air refractive index correction to ensure the high performance of such techniques when they are applied in air. In this study, we developed a novel heterodyne interferometry technique based on two-colour frequency combs for air refractive index correction. In continuous 500-second tests, a stability of 1.0 × 10−11 was achieved in the measurement of the difference in the optical distance between two wavelengths. Furthermore, the measurement results and the calculations are in nearly perfect agreement, with a standard deviation of 3.8 × 10−11 throughout the 10-hour period. The final two-colour correction of the refractive index of air over a path length of 61 m was demonstrated to exhibit an uncertainty better than 1.4 × 10−8, which is the best result ever reported without precise knowledge of environmental parameters. PMID:23719387

Near-IR laser frequency standard stabilized using FM-spectroscopy

NASA Astrophysics Data System (ADS)

Ružička, Bohdan; Číp, Ondřej; Lazar, Josef

2006-02-01

At the present time fiber-optics and optical communication are in rapid progress. Modern technologies such as DWDM (Dense Wavelength Division Multiplex) need precise stability of laser frequencies. According to this fact, requirements of new etalons of optical frequencies in the telecommunication band is rapidly growing. Lasers working in near infrared telecommunication band (1500-1600 nm) can be stabilized to 12C IIH II or 13C IIH II (acetylene) gas absorption lines. The acetylene gas absorption has been widely studied and accepted by international bodies of standardization as a primary wavelength reference in the near infrared band around 1550nm. Our aim was to design and develop a compact fibre optics laser system generating coherent light in near-JR band with high frequency stability (at least 1.10 -8). This system should become a base for realization of a primary frequency standard for optical communications in the Czech Republic. Such an etalon will be needed for calibration of wavelength-meters and spectral analysers for DWDM communication systems. We are co-operating with CMI (Czech Metrology Institute) on this project. We present stabilized laser system based on a single frequency DFB (Distributed Feedback) laser diode with a narrow spectral profile. The laser is pre-stabilized by means of the FM-spectroscopy on a passive resonator. Thanks to a fast feed-back loop we are able to improve spectral characteristics of the laser. The laser frequency is locked by a relatively slow second feed-back loop on an absorption line of acetylene vapour which is sealed in a cell under the optimised pressure.

A New Type of Frequency Chain and Its Application to Fundamental Frequency Metrology

NASA Astrophysics Data System (ADS)

Udem, Thomas; Reichert, Joerg; Holzwarth, Ronald; Diddams, Scott; Jones, David; Ye, Jun; Cundiff, Steven; Haensch, Theodor; Hall, John

A suitable femtosecond (fs) laser system can provide a broad band comb of stable optical frequencies and thus can serve as an rf/optical coherent link. In this way we have performed a direct comparison of the 1S-2S transition in atomic hydrogen at 121 nm with a cesium fountain clock, built at the LPTF/Paris, to reach an accuracy of 1.9times 10^{-14}. The same comb-line counting technique was exploited to determine and recalibrate several important optical frequency standards. In particular, the improved measurement of the Cesium D1 line is necessary for a more precise determination of the fine structure constant. In addition, several of the best-known optical frequency standards have been recalibrated via the fs method. By creating an octave-spanning frequency comb a single-laser frequency chain has been realized and tested.

Progress toward Brazilian cesium fountain second generation

NASA Astrophysics Data System (ADS)

Bueno, Caio; Rodriguez Salas, Andrés; Torres Müller, Stella; Bagnato, Vanderlei Salvador; Varela Magalhães, Daniel

2018-03-01

The operation of a Cesium fountain primary frequency standard is strongly influenced by the characteristics of two important subsystems. The first is a stable frequency reference and the second is the frequency-transfer system. A stable standard frequency reference is key factor for experiments that require high accuracy and precision. The frequency stability of this reference has a significant impact on the procedures for evaluating certain systematic biases in frequency standards. This paper presents the second generation of the Brazilian Cesium Fountain (Br-CsF) through the opto-mechanical assembly and vacuum chamber to trap atoms. We used a squared section glass profile to build the region where the atoms are trapped and colled by magneto-optical technique. The opto-mechanical system was reduced to increase stability and robustness. This newest Atomic Fountain is essential to contribute with time and frequency development in metrology systems.

EDITORIAL: Nanometrology Nanometrology

NASA Astrophysics Data System (ADS)

Tanaka, Mitsuru; Baba, Tetsuya; Postek, Michael T.

2011-02-01

Nanomanufacturing is an essential bridge between the discoveries of nanoscience and real-world nanotech products and is the vehicle by which the world will realize the promise of major technological innovation across a spectrum of products that will affect virtually every industrial sector. For micro and nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, economical and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust manufacturing at the nanoscale is the development of the necessary instrumentation, metrology and standards, i.e. nanometrology. The National Measurement Laboratories are committed to developing the required metrology. Integration of the instruments, their interoperability and appropriate information management are also critical elements that must be considered for viable micro and nanomanufacturing. Advanced instrumentation, metrology and standards will allow the physical dimensions, properties, functionality and purity of the materials, processes, tools, systems, products and emissions that will constitute micro and nanomanufacturing to be measured and characterized. This will in turn enable production to be scalable, controllable, predictable and repeatable to meet market needs. If a product cannot be measured it cannot be manufactured; if that product cannot be made safely it should not be manufactured, and finally, if the metrology is not in place how would you know? The articles in this special feature can be classified into three categories: dimensional metrology (8 papers and one technical design note), density of particles (2 papers) and metrology of thermal properties (3 papers). The articles on dimensional metrology include scanning probe microscope dimensional metrology, the through focus scanning optical (TSOM) imaging method, scatterfield optical microscopy, helium ion microscopy, metrology and combinations of these microscopy and imaging techniques applied to nanostructures and particles such as cellulose nanocrystals, and targeted liposome-based delivery systems. Dimensional metrology covers grating pitch measurement by optical diffraction, measurement of the thickness of silicon oxide by synchrotron radiation x-ray photoelectron spectroscopy (SR-XPS) analysis and determination of pore size distribution of porous low-dielectric-constant films by x-ray scattering. The two papers on particle density present number concentration standards for aerosol nanoparticles of larger diameter than about 10 nm and liquid-borne particles in the range of 10-20 µm diameter, respectively. The three papers on metrology of thermal properties present recent innovative progress in thermophysical metrology of thin films by the ultrafast laser flash methods required for understanding of the thermal science at nanoscales and thermal design of nanodevices. The first paper improves the technology applicable under high pressures in a diamond anvil cell. The second extends this technology to thin films on silicon substrates. The third reports the first observation of non-diffusive heat transfer across thin films at low temperatures. In order to guarantee reliability and traceability of developed measurement methods for nanomaterials, a technical infrastructure for nanomaterials such as metrological standards, reference materials and document standards for measurement methods is important. We hope this special feature will be the first step in a collaboration towards a global harmonization of nanometrology.

In-Line Detection and Measurement of Molecular Contamination in Semiconductor Process Solutions

NASA Astrophysics Data System (ADS)

Wang, Jason; West, Michael; Han, Ye; McDonald, Robert C.; Yang, Wenjing; Ormond, Bob; Saini, Harmesh

2005-09-01

This paper discusses a fully automated metrology tool for detection and quantitative measurement of contamination, including cationic, anionic, metallic, organic, and molecular species present in semiconductor process solutions. The instrument is based on an electrospray ionization time-of-flight mass spectrometer (ESI-TOF/MS) platform. The tool can be used in diagnostic or analytical modes to understand process problems in addition to enabling routine metrology functions. Metrology functions include in-line contamination measurement with near real-time trend analysis. This paper discusses representative organic and molecular contamination measurement results in production process problem solving efforts. The examples include the analysis and identification of organic compounds in SC-1 pre-gate clean solution; urea, NMP (N-Methyl-2-pyrrolidone) and phosphoric acid contamination in UPW; and plasticizer and an organic sulfur-containing compound found in isopropyl alcohol (IPA). It is expected that these unique analytical and metrology capabilities will improve the understanding of the effect of organic and molecular contamination on device performance and yield. This will permit the development of quantitative correlations between contamination levels and process degradation. It is also expected that the ability to perform routine process chemistry metrology will lead to corresponding improvements in manufacturing process control and yield, the ability to avoid excursions and will improve the overall cost effectiveness of the semiconductor manufacturing process.

Measuring soot particles from automotive exhaust emissions

NASA Astrophysics Data System (ADS)

Andres, Hanspeter; Lüönd, Felix; Schlatter, Jürg; Auderset, Kevin; Jordan-Gerkens, Anke; Nowak, Andreas; Ebert, Volker; Buhr, Egbert; Klein, Tobias; Tuch, Thomas; Wiedensohler, Alfred; Mamakos, Athanasios; Riccobono, Francesco; Discher, Kai; Högström, Richard; Yli-Ojanperä, Jaakko; Quincey, Paul

2014-08-01

The European Metrology Research Programme participating countries and the European Union jointly fund a three year project to address the need of the automotive industry for a metrological sound base for exhaust measurements. The collaborative work on particle emissions involves five European National Metrology Institutes, the Tampere University of Technology, the Joint Research Centre for Energy and Transport and the Leibniz Institute for Tropospheric Research. On one hand, a particle number and size standard for soot particles is aimed for. Eventually this will allow the partners to provide accurate and comparable calibrations of measurement instruments for the type approval of Euro 5b and Euro 6 vehicles. Calibration aerosols of combustion particles, silver and graphite proof partially suitable. Yet, a consensus choice together with instrument manufactures is pending as the aerosol choice considerably affects the number concentration measurement. Furthermore, the consortium issued consistent requirements for novel measuring instruments foreseen to replace today's opacimeters in regulatory periodic emission controls of soot and compared them with European legislative requirements. Four partners are conducting a metrological validation of prototype measurement instruments. The novel instruments base on light scattering, electrical, ionisation chamber and diffusion charging sensors and will be tested at low and high particle concentrations. Results shall allow manufacturers to further improve their instruments to comply with legal requirements.

UTC(SU) and EOP(SU) - the only legal reference frames of Russian Federation

NASA Astrophysics Data System (ADS)

Koshelyaevsky, Nikolay B.; Blinov, Igor Yu; Pasynok, Sergey L.

2015-08-01

There are two legal time reference frames in Russian Federation. UTC(SU) deals with atomic time and play a role of reference for legal timing through the whole country. The other one, EOP(SU), deals with Earth's orientation parameters and provides the official EOP data for scientific, technical and metrological applications in Russia.The atomic time is based on two essential hardware components: primary Cs fountain standards and ensemble of continuously operating H-masers as a time unit/time scale keeper. Basing on H-maser intercomparison system data, regular H-maser frequency calibration against Cs standards and time algorithm autonomous TA(SU) time scale is maintained by the Main Metrological Center. Since 2013 time unit in TA(SU) is the second (SU) reproduced independently by VNIIFTRI Cs primary standards in accordance to it’s definition in the SI. UTC(SU) is relied on TA(SU) and steering to UTC basing on TWSTFT/GNSS time link data. As a result TA(SU) stability level relative to TT considerably exceeds 1×10-15 for sample time one month and more, RMS[UTC-UTC(SU)] ≤ 3 ns for the period of 2013-2015. UTC(SU) is broadcasted by different national means such as specialized radio and TV stations, NTP servers and GLONASS. Signals of Russian radio stations contains DUT1 and dUT1 values at 0.1s and 0.02s resolution respectively.The definitive EOP(SU) are calculated by the Main Metrological Center basing on composition of the eight independent individual EOP data streams delivered by four Russian analysis centers: VNIIFTRI, Institute of Applied Astronomy, Information-Analytical Center of Russian Space Agency and Analysis Center of Russian Space Agency. The accuracy of ultra-rapid EOP values for 2014 is estimated ≤ 0.0006" for polar motion, ≤ 70 microseconds for UT1-UTC and ≤ 0.0003" for celestial pole offsets respectively.The other VNIIFTRI EOP activities can be grouped in three basic directions:- arrangement and carrying out GNSS and SLR observations at five institutes- processing GNSS, SLR and VLBI observation data for EOP evaluation- combination of GLONASS satellites orbit/clocks.The paper will deliver more detailed and particular information on Russian legal reference frames.

Achieving the Heisenberg limit in quantum metrology using quantum error correction.

PubMed

Zhou, Sisi; Zhang, Mengzhen; Preskill, John; Jiang, Liang

2018-01-08

Quantum metrology has many important applications in science and technology, ranging from frequency spectroscopy to gravitational wave detection. Quantum mechanics imposes a fundamental limit on measurement precision, called the Heisenberg limit, which can be achieved for noiseless quantum systems, but is not achievable in general for systems subject to noise. Here we study how measurement precision can be enhanced through quantum error correction, a general method for protecting a quantum system from the damaging effects of noise. We find a necessary and sufficient condition for achieving the Heisenberg limit using quantum probes subject to Markovian noise, assuming that noiseless ancilla systems are available, and that fast, accurate quantum processing can be performed. When the sufficient condition is satisfied, a quantum error-correcting code can be constructed that suppresses the noise without obscuring the signal; the optimal code, achieving the best possible precision, can be found by solving a semidefinite program.

Time and Frequency Transfer Activities at NIST

DTIC Science & Technology

2008-12-01

differences. The graph shows data from MJD 54466 to MJD 54763 (January 1, 2008 to October 24, 2008). II.E. The Sistema Interamericano de...Metrologia (SIM) Time Network The Sistema Interamericano de Metrologia (SIM) consists of national metrology institutes (NMIs) located in the 34...designed to mitigate multipath signals. All SIM systems are connected to the Internet and upload their measurement results to Internet Web servers

Experimental implementation of a nonlinear beamsplitter based on a phase-sensitive parametric amplifier

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fang, Yami; Feng, Jingliang; Cao, Leiming

2016-03-28

Beamsplitters have played an important role in quantum optics experiments. They are often used to split and combine two beams, especially in the construct of an interferometer. In this letter, we experimentally implement a nonlinear beamsplitter using a phase-sensitive parametric amplifier, which is based on four-wave mixing in hot rubidium vapor. Here we show that, despite the different frequencies of the two input beams, the output ports of the nonlinear beamsplitter exhibit interference phenomena. We make measurements of the interference fringe visibility and study how various parameters, such as the intensity gain of the amplifier, the intensity ratio of themore » two input beams, and the one and two photon detunings, affect the behavior of the nonlinear beamsplitter. It may find potential applications in quantum metrology and quantum information processing.« less

Dimensional metrology of micro structure based on modulation depth in scanning broadband light interferometry

NASA Astrophysics Data System (ADS)

Zhou, Yi; Tang, Yan; Deng, Qinyuan; Zhao, Lixin; Hu, Song

2017-08-01

Three-dimensional measurement and inspection is an area with growing needs and interests in many domains, such as integrated circuits (IC), medical cure, and chemistry. Among the methods, broadband light interferometry is widely utilized due to its large measurement range, noncontact and high precision. In this paper, we propose a spatial modulation depth-based method to retrieve the surface topography through analyzing the characteristics of both frequency and spatial domains in the interferogram. Due to the characteristics of spatial modulation depth, the technique could effectively suppress the negative influences caused by light fluctuations and external disturbance. Both theory and experiments are elaborated to confirm that the proposed method can greatly improve the measurement stability and sensitivity with high precision. This technique can achieve a superior robustness with the potential to be applied in online topography measurement.

Traceable quantum sensing and metrology relied up a quantum electrical triangle principle

NASA Astrophysics Data System (ADS)

Fang, Yan; Wang, Hengliang; Yang, Xinju; Wei, Jingsong

2016-11-01

Hybrid quantum state engineering in quantum communication and imaging1-2 needs traceable quantum sensing and metrology, which are especially critical to quantum internet3 and precision measurements4 that are important across all fields of science and technology-. We aim to set up a mode of traceable quantum sensing and metrology. We developed a method by specially transforming an atomic force microscopy (AFM) and a scanning tunneling microscopy (STM) into a conducting atomic force microscopy (C-AFM) with a feedback control loop, wherein quantum entanglement enabling higher precision was relied upon a set-point, a visible light laser beam-controlled an interferometer with a surface standard at z axis, diffractometers with lateral standards at x-y axes, four-quadrant photodiode detectors, a scanner and its image software, a phase-locked pre-amplifier, a cantilever with a kHz Pt/Au conducting tip, a double barrier tunneling junction model, a STM circuit by frequency modulation and a quantum electrical triangle principle involving single electron tunneling effect, quantum Hall effect and Josephson effect5. The average and standard deviation result of repeated measurements on a 1 nm height local micro-region of nanomedicine crystal hybrid quantum state engineering surface and its differential pA level current and voltage (dI/dV) in time domains by using C-AFM was converted into an international system of units: Siemens (S), an indicated value 0.86×10-12 S (n=6) of a relative standard uncertainty was superior over a relative standard uncertainty reference value 2.3×10-10 S of 2012 CODADA quantized conductance6. It is concluded that traceable quantum sensing and metrology is emerging.

Efficient hybrid metrology for focus, CD, and overlay

NASA Astrophysics Data System (ADS)

Tel, W. T.; Segers, B.; Anunciado, R.; Zhang, Y.; Wong, P.; Hasan, T.; Prentice, C.

2017-03-01

In the advent of multiple patterning techniques in semiconductor industry, metrology has progressively become a burden. With multiple patterning techniques such as Litho-Etch-Litho-Etch and Sidewall Assisted Double Patterning, the number of processing step have increased significantly and therefore, so as the amount of metrology steps needed for both control and yield monitoring. The amount of metrology needed is increasing in each and every node as more layers needed multiple patterning steps, and more patterning steps per layer. In addition to this, there is that need for guided defect inspection, which in itself requires substantially denser focus, overlay, and CD metrology as before. Metrology efficiency will therefore be cruicial to the next semiconductor nodes. ASML's emulated wafer concept offers a highly efficient method for hybrid metrology for focus, CD, and overlay. In this concept metrology is combined with scanner's sensor data in order to predict the on-product performance. The principle underlying the method is to isolate and estimate individual root-causes which are then combined to compute the on-product performance. The goal is to use all the information available to avoid ever increasing amounts of metrology.

[Optimization of measurement methods for a multi-frequency electromagnetic field from mobile phone base station using broadband EMF meter].

PubMed

Bieńkowski, Paweł; Cała, Paweł; Zubrzak, Bartłomiej

2015-01-01

This paper presents the characteristics of the mobile phone base station (BS) as an electromagnetic field (EMF) source. The most common system configurations with their construction are described. The parameters of radiated EMF in the context of the access to methods and other parameters of the radio transmission are discussed. Attention was also paid to antennas that are used in this technology. The influence of individual components of a multi-frequency EMF, most commonly found in the BS surroundings, on the resultant EMF strength value indicated by popular broadband EMF meters was analyzed. The examples of metrological characteristics of the most common EMF probes and 2 measurement scenarios of the multisystem base station, with and without microwave relays, are shown. The presented method for measuring the multi-frequency EMF using 2 broadband probes allows for the significant minimization of measurement uncertainty. Equations and formulas that can be used to calculate the actual EMF intensity from multi-frequency sources are shown. They have been verified in the laboratory conditions on a specific standard setup as well as in real conditions in a survey of the existing base station with microwave relays. Presented measurement methodology of multi-frequency EMF from BS with microwave relays, validated both in laboratory and real conditions. It has been proven that the described measurement methodology is the optimal approach to the evaluation of EMF exposure in BS surrounding. Alternative approaches with much greater uncertainty (precaution method) or more complex measuring procedure (sources exclusion method) are also presented). This work is available in Open Access model and licensed under a CC BY-NC 3.0 PL license.

High throughput wafer defect monitor for integrated metrology applications in photolithography

NASA Astrophysics Data System (ADS)

Rao, Nagaraja; Kinney, Patrick; Gupta, Anand

2008-03-01

The traditional approach to semiconductor wafer inspection is based on the use of stand-alone metrology tools, which while highly sensitive, are large, expensive and slow, requiring inspection to be performed off-line and on a lot sampling basis. Due to the long cycle times and sparse sampling, the current wafer inspection approach is not suited to rapid detection of process excursions that affect yield. The semiconductor industry is gradually moving towards deploying integrated metrology tools for real-time "monitoring" of product wafers during the manufacturing process. Integrated metrology aims to provide end-users with rapid feedback of problems during the manufacturing process, and the benefit of increased yield, and reduced rework and scrap. The approach of monitoring 100% of the wafers being processed requires some trade-off in sensitivity compared to traditional standalone metrology tools, but not by much. This paper describes a compact, low-cost wafer defect monitor suitable for integrated metrology applications and capable of detecting submicron defects on semiconductor wafers at an inspection rate of about 10 seconds per wafer (or 360 wafers per hour). The wafer monitor uses a whole wafer imaging approach to detect defects on both un-patterned and patterned wafers. Laboratory tests with a prototype system have demonstrated sensitivity down to 0.3 µm on un-patterned wafers and down to 1 µm on patterned wafers, at inspection rates of 10 seconds per wafer. An ideal application for this technology is preventing photolithography defects such as "hot spots" by implementing a wafer backside monitoring step prior to exposing wafers in the lithography step.

7/5nm logic manufacturing capabilities and requirements of metrology

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

2018-03-01

This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

Telecom-band degenerate-frequency photon pair generation in silicon microring cavities.

PubMed

Guo, Yuan; Zhang, Wei; Dong, Shuai; Huang, Yidong; Peng, Jiangde

2014-04-15

In this Letter, telecom-band degenerate-frequency photon pairs are generated in a specific mode of a silicon microring cavity by the nondegenerate spontaneous four-wave mixing (SFWM) process, under two continuous-wave pumps at resonance wavelength of two different cavity modes. The ratio of coincidence to accidental coincidence is up to 100 under a time bin width of 5 ns, showing their characteristics of quantum correlation. Their quantum interference in balanced and unbalanced Mach-Zehnder interferometers is investigated theoretically and experimentally, and the results show potential in quantum metrology and quantum information.

Modernization of Koesters interferometer and high accuracy calibration gauge blocks

NASA Astrophysics Data System (ADS)

França, R. S.; Silva, I. L. M.; Couceiro, I. B.; Torres, M. A. C.; Bessa, M. S.; Costa, P. A.; Oliveira, W., Jr.; Grieneisen, H. P. H.

2016-07-01

The Optical Metrology Division (Diopt) of Inmetro is responsible for maintaining the national reference of the length unit according to International System of Units (SI) definitions. The length unit is realized by interferometric techniques and is disseminated to the dimensional community through calibrations of gauge blocks. Calibration of large gauge blocks from 100 mm to 1000 mm has been performed by Diopt with a Koesters interferometer with reference to spectral lines of a krypton discharge lamp. Replacement of this lamp by frequency stabilized lasers, traceable now to the time and frequency scale, is described and the first results are reported.

An ultra-stable optical frequency standard for telecommunication purposes based upon the 5S1/2 → 5D5/2 two-photon transition in rubidium

NASA Astrophysics Data System (ADS)

Terra, Osama; Hussein, Hatem

2016-02-01

In this study, we report the development of a frequency standard for optical fiber communication applications based on a two-photon transition in rubidium at 385.2 THz. This standard kills two birds with one stone in the sense it is capable of providing us with two highly stable serviceable wavelengths at 778.1 and 1556.2 nm. In this system, we exploit the narrow line-width of a fiber laser emitting at 1556.2 nm in conjunction with an erbium-doped fiber amplifier to generate a sufficient second harmonic laser beam at 778.1 nm in a periodically polled lithium niobate waveguide mixer in order to probe and frequency-lock the laser to the 5S1/2 ( F g = 3)-5D5/2 ( F e = 5) hyperfine two-photon transition component in 85Rb. The metrological performance of the standard is evaluated with the aid of an optical frequency comb synthesizer. Allan variance measurement shows a stability of 4 × 10-12 at 1 s (limited by the comb stability), reaching a floor of 6.8 × 10-13 at 1000 s. After correction of all the major systematic frequency shifts including the light shift, the absolute frequency is found to be 385 285 142 374.0 (5.0) kHz. Moreover, the absolute frequencies of most of the hyperfine components of the 5S1/2-5D5/2 transition of the two naturally existing rubidium isotopes are measured using a femtosecond frequency comb synthesizer after stabilizing a laser on each component.

Quantum cascade transmitters for ultrasensitive chemical agent and explosives detection

NASA Astrophysics Data System (ADS)

Schultz, John F.; Taubman, Matthew S.; Harper, Warren W.; Williams, Richard M.; Myers, Tanya L.; Cannon, Bret D.; Sheen, David M.; Anheier, Norman C., Jr.; Allen, Paul J.; Sundaram, S. K.; Johnson, Bradley R.; Aker, Pamela M.; Wu, Ming C.; Lau, Erwin K.

2003-07-01

The small size, high power, promise of access to any wavelength between 3.5 and 16 microns, substantial tuning range about a chosen center wavelength, and general robustness of quantum cascade (QC) lasers provide opportunities for new approaches to ultra-sensitive chemical detection and other applications in the mid-wave infrared. PNNL is developing novel remote and sampling chemical sensing systems based on QC lasers, using QC lasers loaned by Lucent Technologies. In recent months laboratory cavity-enhanced sensing experiments have achieved absorption sensitivities of 8.5 x 10-11 cm-1 Hz-1/2, and the PNNL team has begun monostatic and bi-static frequency modulated, differential absorption lidar (FM DIAL) experiments at ranges of up to 2.5 kilometers. In related work, PNNL and UCLA are developing miniature QC laser transmitters with the multiplexed tunable wavelengths, frequency and amplitude stability, modulation characteristics, and power levels needed for chemical sensing and other applications. Current miniaturization concepts envision coupling QC oscillators, QC amplifiers, frequency references, and detectors with miniature waveguides and waveguide-based modulators, isolators, and other devices formed from chalcogenide or other types of glass. Significant progress has been made on QC laser stabilization and amplification, and on development and characterization of high-purity chalcogenide glasses, waveguide writing techniques, and waveguide metrology.

Achieving optimum diffraction based overlay performance

NASA Astrophysics Data System (ADS)

Leray, Philippe; Laidler, David; Cheng, Shaunee; Coogans, Martyn; Fuchs, Andreas; Ponomarenko, Mariya; van der Schaar, Maurits; Vanoppen, Peter

2010-03-01

Diffraction Based Overlay (DBO) metrology has been shown to have significantly reduced Total Measurement Uncertainty (TMU) compared to Image Based Overlay (IBO), primarily due to having no measurable Tool Induced Shift (TIS). However, the advantages of having no measurable TIS can be outweighed by increased susceptibility to WIS (Wafer Induced Shift) caused by target damage, process non-uniformities and variations. The path to optimum DBO performance lies in having well characterized metrology targets, which are insensitive to process non-uniformities and variations, in combination with optimized recipes which take advantage of advanced DBO designs. In this work we examine the impact of different degrees of process non-uniformity and target damage on DBO measurement gratings and study their impact on overlay measurement accuracy and precision. Multiple wavelength and dual polarization scatterometry are used to characterize the DBO design performance over the range of process variation. In conclusion, we describe the robustness of DBO metrology to target damage and show how to exploit the measurement capability of a multiple wavelength, dual polarization scatterometry tool to ensure the required measurement accuracy for current and future technology nodes.

Vernier-like super resolution with guided correlated photon pairs.

PubMed

Nespoli, Matteo; Goan, Hsi-Sheng; Shih, Min-Hsiung

2016-01-11

We describe a dispersion-enabled, ultra-low power realization of super-resolution in an integrated Mach-Zehnder interferometer. Our scheme is based on a Vernier-like effect in the coincident detection of frequency correlated, non-degenerate photon pairs at the sensor output in the presence of group index dispersion. We design and simulate a realistic integrated refractive index sensor in a silicon nitride on silica platform and characterize its performance in the proposed scheme. We present numerical results showing a sensitivity improvement upward of 40 times over a traditional sensing scheme. The device we design is well within the reach of modern semiconductor fabrication technology. We believe this is the first metrology scheme that uses waveguide group index dispersion as a resource to attain super-resolution.

High-power all-fiber ultra-low noise laser

NASA Astrophysics Data System (ADS)

Zhao, Jian; Guiraud, Germain; Pierre, Christophe; Floissat, Florian; Casanova, Alexis; Hreibi, Ali; Chaibi, Walid; Traynor, Nicholas; Boullet, Johan; Santarelli, Giorgio

2018-06-01

High-power ultra-low noise single-mode single-frequency lasers are in great demand for interferometric metrology. Robust, compact all-fiber lasers represent one of the most promising technologies to replace the current laser sources in use based on injection-locked ring resonators or multi-stage solid-state amplifiers. Here, a linearly polarized high-power ultra-low noise all-fiber laser is demonstrated at a power level of 100 W. Special care has been taken in the study of relative intensity noise (RIN) and its reduction. Using an optimized servo actuator to directly control the driving current of the pump laser diode, we obtain a large feedback bandwidth of up to 1.3 MHz. The RIN reaches - 160 dBc/Hz between 3 and 20 kHz.

Ground-based demonstration of the European Laser Timing (ELT) experiment.

PubMed

Schreiber, Karl Ulrich; Prochazka, Ivan; Lauber, Pierre; Hugentobler, Urs; Schäfer, Wolfgang; Cacciapuoti, Luigi; Nasca, Rosario

2010-03-01

The development of techniques for the comparison of distant clocks and for the distribution of stable and accurate time scales has important applications in metrology and fundamental physics research. Additionally, the rapid progress of frequency standards in the optical domain is presently demanding additional efforts for improving the performances of existing time and frequency transfer links. Present clock comparison systems in the microwave domain are based on GPS and two-way satellite time and frequency transfer (TWSTFT). European Laser Timing (ELT) is an optical link presently under study in the frame of the ESA mission Atomic Clock Ensemble in Space (ACES). The on-board hardware for ELT consists of a corner cube retro-reflector (CCR), a single-photon avalanche diode (SPAD), and an event timer board connected to the ACES time scale. Light pulses fired toward ACES by a laser ranging station will be detected by the SPAD diode and time tagged in the ACES time scale. At the same time, the CCR will re-direct the laser pulse toward the ground station providing precise ranging information. We have carried out a ground-based feasibility study at the Geodetic Observatory Wettzell. By using ordinary satellites with laser reflectors and providing a second independent detection port and laser pulse timing unit with an independent time scale, it is possible to evaluate many aspects of the proposed time transfer link before the ACES launch.

OPC model data collection for 45-nm technology node using automatic CD-SEM offline recipe creation

NASA Astrophysics Data System (ADS)

Fischer, Daniel; Talbi, Mohamed; Wei, Alex; Menadeva, Ovadya; Cornell, Roger

2007-03-01

Optical and Process Correction in the 45nm node is requiring an ever higher level of characterization. The greater complexity drives a need for automation of the metrology process allowing more efficient, accurate and effective use of the engineering resources and metrology tool time in the fab, helping to satisfy what seems an insatiable appetite for data by lithographers and modelers charged with development of 45nm and 32nm processes. The scope of the work referenced here is a 45nm design cycle "full-loop automation", starting with gds formatted target design layout and ending with the necessary feedback of one and two dimensional printed wafer metrology. In this paper the authors consider the key elements of software, algorithmic framework and Critical Dimension Scanning Electron Microscope (CDSEM) functionality necessary to automate its recipe creation. We evaluate specific problems with the methodology of the former art, "on-tool on-wafer" recipe construction, and discuss how the implementation of the design based recipe generation improves upon the overall metrology process. Individual target-by-target construction, use of a one pattern recognition template fits all approach, a blind navigation to the desired measurement feature, lengthy sessions on tool to construct recipes and limited ability to determine measurement quality in the resultant data set are each discussed as to how the state of the art Design Based Metrology (DBM) approach is implemented. The offline created recipes have shown pattern recognition success rates of up to 100% and measurement success rates of up to 93% for line/space as well as for 2D Minimum/Maximum measurements without manual assists during measurement.

Improving Metrological Reliability of Information-Measuring Systems Using Mathematical Modeling of Their Metrological Characteristics

NASA Astrophysics Data System (ADS)

Kurnosov, R. Yu; Chernyshova, T. I.; Chernyshov, V. N.

2018-05-01

The algorithms for improving the metrological reliability of analogue blocks of measuring channels and information-measuring systems are developed. The proposed algorithms ensure the optimum values of their metrological reliability indices for a given analogue circuit block solution.

Accuracy improvement in a calibration test bench for accelerometers by a vision system

DOE Office of Scientific and Technical Information (OSTI.GOV)

D’Emilia, Giulio, E-mail: giulio.demilia@univaq.it; Di Gasbarro, David, E-mail: david.digasbarro@graduate.univaq.it; Gaspari, Antonella, E-mail: antonella.gaspari@graduate.univaq.it

2016-06-28

A procedure is described in this paper for the accuracy improvement of calibration of low-cost accelerometers in a prototype rotary test bench, driven by a brushless servo-motor and operating in a low frequency range of vibrations (0 to 5 Hz). Vibration measurements by a vision system based on a low frequency camera have been carried out, in order to reduce the uncertainty of the real acceleration evaluation at the installation point of the sensor to be calibrated. A preliminary test device has been realized and operated in order to evaluate the metrological performances of the vision system, showing a satisfactory behaviormore » if the uncertainty measurement is taken into account. A combination of suitable settings of the control parameters of the motion control system and of the information gained by the vision system allowed to fit the information about the reference acceleration at the installation point to the needs of the procedure for static and dynamic calibration of three-axis accelerometers.« less

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

NASA Astrophysics Data System (ADS)

Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

2004-05-01

Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will bring together formerly unlinked technology fields requiring new measurement science. The emphasis on accuracy will increase the importance and role of NIST and similar metrology organizations in supporting the semiconductor industry in this effort.

[Fundamental aspects for accrediting medical equipment calibration laboratories in Colombia].

PubMed

Llamosa-Rincón, Luis E; López-Isaza, Giovanni A; Villarreal-Castro, Milton F

2010-02-01

Analysing the fundamental methodological aspects which should be considered when drawing up calibration procedure for electro-medical equipment, thereby permitting international standard-based accreditation of electro-medical metrology laboratories in Colombia. NTC-ISO-IEC 17025:2005 and GTC-51-based procedures for calibrating electro-medical equipment were implemented and then used as patterns. The mathematical model for determining the estimated uncertainty value when calibrating electro-medical equipment for accreditation by the Electrical Variable Metrology Laboratory's Electro-medical Equipment Calibration Area accredited in compliance with Superintendence of Industry and Commerce Resolution 25771 May 26th 2009 consists of two equations depending on the case; they are: E = (Ai + sigmaAi) - (Ar + sigmaAr + deltaAr1) and E = (Ai + sigmaAi) - (Ar + sigmaA + deltaAr1). The mathematical modelling implemented for measuring uncertainty in the Universidad Tecnológica de Pereira's Electrical Variable Metrology Laboratory (Electro-medical Equipment Calibration Area) will become a good guide for calibration initiated in other laboratories in Colombia and Latin-America.

Metrology-based control and profitability in the semiconductor industry

NASA Astrophysics Data System (ADS)

Weber, Charles

2001-06-01

This paper summarizes three studies of the semiconductor industry conducted at SEMATECH and MIT's Sloan School of Management. In conjunction they lead to the conclusion that rapid problem solving is an essential component of profitability in the semiconductor industry, and that metrology-based control is instrumental to rapid problem solving. The studies also identify the need for defect attribution. Once a source of a defect has been identified, the appropriate resources--human and technological--need to be brought into the physically optimal location for corrective action. The Internet is likely to enable effective defect attribution by inducing collaboration between different companies.

Quantitative optical metrology with CMOS cameras

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Kolenovic, Ervin; Ferguson, Curtis F.

2004-08-01

Recent advances in laser technology, optical sensing, and computer processing of data, have lead to the development of advanced quantitative optical metrology techniques for high accuracy measurements of absolute shapes and deformations of objects. These techniques provide noninvasive, remote, and full field of view information about the objects of interest. The information obtained relates to changes in shape and/or size of the objects, characterizes anomalies, and provides tools to enhance fabrication processes. Factors that influence selection and applicability of an optical technique include the required sensitivity, accuracy, and precision that are necessary for a particular application. In this paper, sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography (OEH) based on CMOS cameras, are discussed. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gauges, demonstrating the applicability of CMOS cameras in quantitative optical metrology techniques. It is shown that the advanced nature of CMOS technology can be applied to challenging engineering applications, including the study of rapidly evolving phenomena occurring in MEMS and micromechatronics.

Mask Design for the Space Interferometry Mission Internal Metrology

NASA Technical Reports Server (NTRS)

Marx, David; Zhao, Feng; Korechoff, Robert

2005-01-01

This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Pratt, Jon R.; Kramar, John A.; Newell, David B.; Smith, Douglas T.

2005-05-01

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughput, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM-based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International System of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

NASA Astrophysics Data System (ADS)

Acero, R.; Santolaria, J.; Pueo, M.; Aguilar, J. J.; Brau, A.

2015-11-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures.

Aerospace Mechanisms Symposium (22nd) Held at Hampton, Virginia on 4-6 May 1988.

DTIC Science & Technology

1988-05-06

monitoring is accomplished by a pressure transducer located near the hole drilled through the vessel wall between seals. A lip is machined on the...are presented and a design example involving a machine tool metrology bench is given. Design goals included thousandfold strain attenuation in the...systems such as a metrology bench, etc. These bodies must be supported. Six degrees of freedom must be fixed, but if the base upon which they are

Advanced metrology by offline SEM data processing

NASA Astrophysics Data System (ADS)

Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

2017-06-01

Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

Frequency-doubled vertical-external-cavity surface-emitting laser

DOEpatents

Raymond, Thomas D.; Alford, William J.; Crawford, Mary H.; Allerman, Andrew A.

2002-01-01

A frequency-doubled semiconductor vertical-external-cavity surface-emitting laser (VECSEL) is disclosed for generating light at a wavelength in the range of 300-550 nanometers. The VECSEL includes a semiconductor multi-quantum-well active region that is electrically or optically pumped to generate lasing at a fundamental wavelength in the range of 600-1100 nanometers. An intracavity nonlinear frequency-doubling crystal then converts the fundamental lasing into a second-harmonic output beam. With optical pumping with 330 milliWatts from a semiconductor diode pump laser, about 5 milliWatts or more of blue light can be generated at 490 nm. The device has applications for high-density optical data storage and retrieval, laser printing, optical image projection, chemical-sensing, materials processing and optical metrology.

Sub-Doppler Frequency Metrology in HD for Tests of Fundamental Physics

NASA Astrophysics Data System (ADS)

Cozijn, F. M. J.; Dupré, P.; Salumbides, E. J.; Eikema, K. S. E.; Ubachs, W.

2018-04-01

Weak transitions in the (2,0) overtone band of the hydrogen deuteride molecule at λ =1.38 μ m were measured in saturated absorption using the technique of noise-immune cavity-enhanced optical heterodyne molecular spectroscopy. Narrow Doppler-free lines were interrogated with a spectroscopy laser locked to a frequency comb laser referenced to an atomic clock to yield transition frequencies [R (1 )=217105181895 (20 ) kHz ; R (2 )=219042856621 (28 ) kHz ; R (3 )=220704304951 (28 ) kHz ] at three orders of magnitude improved accuracy. These benchmark values provide a test of QED in the smallest neutral molecule, and they open up an avenue to resolve the proton radius puzzle, as well as constrain putative fifth forces and extra dimensions.

Gaps analysis for CD metrology beyond the 22nm node

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Germer, Thomas A.; Vartanian, Victor; Cordes, Aaron; Cepler, Aron; Settens, Charles

2013-04-01

This paper will examine the future for critical dimension (CD) metrology. First, we will present the extensive list of applications for which CD metrology solutions are needed, showing commonalities and differences among the various applications. We will then report on the expected technical limits of the metrology solutions currently being investigated by SEMATECH and others in the industry to address the metrology challenges of future nodes, including conventional CD scanning electron microscopy (CD-SEM) and optical critical dimension (OCD) metrology and new potential solutions such as He-ion microscopy (HeIM, sometimes elsewhere referred to as HIM), CD atomic force microscopy (CD-AFM), CD small-angle x-ray scattering (CD-SAXS), high-voltage scanning electron microscopy (HV-SEM), and other types. A technical gap analysis matrix will then be demonstrated, showing the current state of understanding of the future of the CD metrology space.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

NASA Astrophysics Data System (ADS)

Olyaee, Saeed; Hamedi, Samaneh

2011-02-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Evaluation of 3D metrology potential using a multiple detector CDSEM

NASA Astrophysics Data System (ADS)

Hakii, Hidemitsu; Yonekura, Isao; Nishiyama, Yasushi; Tanaka, Keishi; Komoto, Kenji; Murakawa, Tsutomu; Hiroyama, Mitsuo; Shida, Soichi; Kuribara, Masayuki; Iwai, Toshimichi; Matsumoto, Jun; Nakamura, Takayuki

2012-06-01

As feature sizes of semiconductor device structures have continuously decreased, needs for metrology tools with high precision and excellent linearity over actual pattern sizes have been growing. And it has become important to measure not only two-dimensional (2D) but also three-dimensional (3D) shapes of patterns at 22 nm node and beyond. To meet requirements for 3D metrology capabilities, various pattern metrology tools have been developed. Among those, we assume that CDSEM metrology is the most qualified candidate in the light of its non-destructive, high throughput measurement capabilities that are expected to be extended to the much-awaited 3D metrology technology. On the basis of this supposition, we have developed the 3D metrology system, in which side wall angles and heights of photomask patterns can be measured with high accuracy through analyzing CDSEM images generated by multi-channel detectors. In this paper, we will discuss our attempts to measure 3D shapes of defect patterns on a photomask by using Advantest's "Multi Vision Metrology SEM" E3630 (MVM-SEM' E3630).

Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology

NASA Astrophysics Data System (ADS)

Takamasu, Kiyoshi; Takahashi, Satoru; Kawada, Hiroki; Ikota, Masami

2018-03-01

LER (Line Edge Roughness) and LWR (Line Width Roughness) of the semiconductor device are an important evaluation scale of the performance of the device. Conventionally, LER and LWR is evaluated from CD-SEM (Critical Dimension Scanning Electron Microscope) images. However, CD-SEM measurement has a problem that high frequency random noise is large, and resolution is not sufficiently high. For random noise of CD-SEM measurement, some techniques are proposed. In these methods, it is necessary to set parameters for model and processing, and it is necessary to verify the correctness of these parameters using reference metrology. We have already proposed a novel reference metrology using FIB (Focused Ion Beam) process and planar-TEM (Transmission Electron Microscope) method. In this study, we applied the proposed method to three new samples such as SAQP (Self-Aligned Quadruple Patterning) FinFET device, EUV (Extreme Ultraviolet Lithography) conventional resist, and EUV new material resist. LWR and PSD (Power Spectral Density) of LWR are calculated from the edge positions on planar-TEM images. We confirmed that LWR and PSD of LWR can be measured with high accuracy and evaluated the difference by the proposed method. Furthermore, from comparisons with PSD of the same sample by CD-SEM, the validity of measurement of PSD and LWR by CD-SEM can be verified.

The Complex Relationship Between Heavy Storms and Floods: Implication on Stormwater Drainage design and Management

NASA Astrophysics Data System (ADS)

Demissie, Y.; Mortuza, M. R.; Moges, E.; Yan, E.; Li, H. Y.

2017-12-01

Due to the lack of historical and future streamflow data for flood frequency analysis at or near most drainage sites, it is a common practice to directly estimate the design flood (maximum discharge or volume of stream for a given return period) based on storm frequency analysis and the resulted Intensity-Duration-Frequency (IDF) curves. Such analysis assumes a direct relationship between storms and floods with, for example, the 10-year rainfall expected to produce the 10-year flood. However, in reality, a storm is just one factor among the many other hydrological and metrological factors that can affect the peak flow and hydrograph. Consequently, a heavy storm does not necessarily always lead to flooding or a flood events with the same frequency. This is evident by the observed difference in the seasonality of heavy storms and floods in most regions. In order to understand site specific causal-effect relationship between heavy storms and floods and improve the flood analysis for stormwater drainage design and management, we have examined the contributions of various factors that affect floods using statistical and information theory methods. Based on the identified dominant causal-effect relationships, hydrologic and probability analyses were conducted to develop the runoff IDF curves taking into consideration the snowmelt and rain-on-snow effect, the difference in the storm and flood seasonality, soil moisture conditions, and catchment potential for flash and riverine flooding. The approach was demonstrated using data from military installations located in different parts of the United States. The accuracy of the flood frequency analysis and the resulted runoff IDF curves were evaluated based on the runoff IDF curves developed from streamflow measurements.

Precise and continuous time and frequency synchronisation at the 5×10⁻¹⁹ accuracy level.

PubMed

Wang, B; Gao, C; Chen, W L; Miao, J; Zhu, X; Bai, Y; Zhang, J W; Feng, Y Y; Li, T C; Wang, L J

2012-01-01

The synchronisation of time and frequency between remote locations is crucial for many important applications. Conventional time and frequency dissemination often makes use of satellite links. Recently, the communication fibre network has become an attractive option for long-distance time and frequency dissemination. Here, we demonstrate accurate frequency transfer and time synchronisation via an 80 km fibre link between Tsinghua University (THU) and the National Institute of Metrology of China (NIM). Using a 9.1 GHz microwave modulation and a timing signal carried by two continuous-wave lasers and transferred across the same 80 km urban fibre link, frequency transfer stability at the level of 5×10⁻¹⁹/day was achieved. Time synchronisation at the 50 ps precision level was also demonstrated. The system is reliable and has operated continuously for several months. We further discuss the feasibility of using such frequency and time transfer over 1000 km and its applications to long-baseline radio astronomy.

Precise and Continuous Time and Frequency Synchronisation at the 5×10-19 Accuracy Level

PubMed Central

Wang, B.; Gao, C.; Chen, W. L.; Miao, J.; Zhu, X.; Bai, Y.; Zhang, J. W.; Feng, Y. Y.; Li, T. C.; Wang, L. J.

2012-01-01

The synchronisation of time and frequency between remote locations is crucial for many important applications. Conventional time and frequency dissemination often makes use of satellite links. Recently, the communication fibre network has become an attractive option for long-distance time and frequency dissemination. Here, we demonstrate accurate frequency transfer and time synchronisation via an 80 km fibre link between Tsinghua University (THU) and the National Institute of Metrology of China (NIM). Using a 9.1 GHz microwave modulation and a timing signal carried by two continuous-wave lasers and transferred across the same 80 km urban fibre link, frequency transfer stability at the level of 5×10−19/day was achieved. Time synchronisation at the 50 ps precision level was also demonstrated. The system is reliable and has operated continuously for several months. We further discuss the feasibility of using such frequency and time transfer over 1000 km and its applications to long-baseline radio astronomy. PMID:22870385

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

NASA Astrophysics Data System (ADS)

Bhattacharyya, Kaustuve; Ke, Chih-Ming; Huang, Guo-Tsai; Chen, Kai-Hsiung; Smilde, Henk-Jan H.; Fuchs, Andreas; Jak, Martin; van Schijndel, Mark; Bozkurt, Murat; van der Schaar, Maurits; Meyer, Steffen; Un, Miranda; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Liang, Frida; den Boef, Arie; ten Berge, Peter; Kubis, Michael; Wang, Cathy; Fouquet, Christophe; Terng, L. G.; Hwang, David; Cheng, Kevin; Gau, TS; Ku, Y. C.

2013-04-01

Aggressive on-product overlay requirements in advanced nodes are setting a superior challenge for the semiconductor industry. This forces the industry to look beyond the traditional way-of-working and invest in several new technologies. Integrated metrology2, in-chip overlay control, advanced sampling and process correction-mechanism (using the highest order of correction possible with scanner interface today), are a few of such technologies considered in this publication.

Rules for Optical Testing

NASA Technical Reports Server (NTRS)

Stahl, H. Philip

2014-01-01

Based on 30 years of optical testing experience, a lot of mistakes, a lot of learning and a lot of experience, I have defined seven guiding principles for optical testing - regardless of how small or how large the optical testing or metrology task: Fully Understand the Task, Develop an Error Budget, Continuous Metrology Coverage, Know where you are, Test like you fly, Independent Cross-Checks, Understand All Anomalies. These rules have been applied with great success to the inprocess optical testing and final specification compliance testing of the JWST mirrors.

Metrology for industrial quantum communications: the MIQC project

NASA Astrophysics Data System (ADS)

Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

2014-12-01

The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

On the detectability of the Lense-Thirring field from rotating laboratory masses using ring laser gyroscope interferometers

NASA Astrophysics Data System (ADS)

Stedman, G. E.; Schreiber, K. U.; Bilger, H. R.

2003-07-01

The possibility of detecting the Lense-Thirring field generated by the rotating earth (also rotating laboratory masses) is reassessed in view of recent dramatic advances in the technology of ring laser gyroscopes. This possibility is very much less remote than it was a decade ago. The effect may contribute significantly to the Sagnac frequency of planned instruments. Its discrimination and detection will require an improved metrology, linking the ring to the celestial reference frame, and a fuller study of dispersion- and backscatter-induced frequency pulling. Both these requirements have been the subject of recent major progress, and our goal looks feasible.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V; Conley, Raymond; Anderson, Erik H.

We discuss the results of SEM and TEM measurements with the BPRML test samples fabricated from a BPRML (WSi2/Si with fundamental layer thickness of 3 nm) with a Dual Beam FIB (focused ion beam)/SEM technique. In particular, we demonstrate that significant information about the metrological reliability of the TEM measurements can be extracted even when the fundamental frequency of the BPRML sample is smaller than the Nyquist frequency of the measurements. The measurements demonstrate a number of problems related to the interpretation of the SEM and TEM data. Note that similar BPRML test samples can be used to characterize x-raymore » microscopes. Corresponding work with x-ray microscopes is in progress.« less

Sensitivity, accuracy, and precision issues in opto-electronic holography based on fiber optics and high-spatial- and high-digitial-resolution cameras

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Yokum, Jeffrey S.; Pryputniewicz, Ryszard J.

2002-06-01

Sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography based on fiber optics and high-spatial and high-digital resolution cameras, are discussed in this paper. It is shown that sensitivity, accuracy, and precision dependent on both, the effective determination of optical phase and the effective characterization of the illumination-observation conditions. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gages, demonstrating the applicability of quantitative optical metrology techniques to satisfy constantly increasing needs for the study and development of emerging technologies.

A novel methodology for building robust design rules by using design based metrology (DBM)

NASA Astrophysics Data System (ADS)

Lee, Myeongdong; Choi, Seiryung; Choi, Jinwoo; Kim, Jeahyun; Sung, Hyunju; Yeo, Hyunyoung; Shim, Myoungseob; Jin, Gyoyoung; Chung, Eunseung; Roh, Yonghan

2013-03-01

This paper addresses a methodology for building robust design rules by using design based metrology (DBM). Conventional method for building design rules has been using a simulation tool and a simple pattern spider mask. At the early stage of the device, the estimation of simulation tool is poor. And the evaluation of the simple pattern spider mask is rather subjective because it depends on the experiential judgment of an engineer. In this work, we designed a huge number of pattern situations including various 1D and 2D design structures. In order to overcome the difficulties of inspecting many types of patterns, we introduced Design Based Metrology (DBM) of Nano Geometry Research, Inc. And those mass patterns could be inspected at a fast speed with DBM. We also carried out quantitative analysis on PWQ silicon data to estimate process variability. Our methodology demonstrates high speed and accuracy for building design rules. All of test patterns were inspected within a few hours. Mass silicon data were handled with not personal decision but statistical processing. From the results, robust design rules are successfully verified and extracted. Finally we found out that our methodology is appropriate for building robust design rules.

Six-Port Based Interferometry for Precise Radar and Sensing Applications.

PubMed

Koelpin, Alexander; Lurz, Fabian; Linz, Sarah; Mann, Sebastian; Will, Christoph; Lindner, Stefan

2016-09-22

Microwave technology plays a more important role in modern industrial sensing applications. Pushed by the significant progress in monolithic microwave integrated circuit technology over the past decades, complex sensing systems operating in the microwave and even millimeter-wave range are available for reasonable costs combined with exquisite performance. In the context of industrial sensing, this stimulates new approaches for metrology based on microwave technology. An old measurement principle nearly forgotten over the years has recently gained more and more attention in both academia and industry: the six-port interferometer. This paper reviews the basic concept, investigates promising applications in remote, as well as contact-based sensing and compares the system with state-of-the-art metrology. The significant advantages will be discussed just as the limitations of the six-port architecture. Particular attention will be paid to impairment effects and non-ideal behavior, as well as compensation and linearization concepts. It will be shown that in application fields, like remote distance sensing, precise alignment measurements, as well as interferometrically-evaluated mechanical strain analysis, the six-port architecture delivers extraordinary measurement results combined with high measurement data update rates for reasonable system costs. This makes the six-port architecture a promising candidate for industrial metrology.

All-fiber mode-locked erbium-doped ring laser based on a highly-nonlinear resonator with a low-noise ultrashort pulse generation

NASA Astrophysics Data System (ADS)

Kudelin, Igor S.; Dvoretskiy, Dmitriy A.; Sazonkin, Stanislav G.; Orekhov, Ilya O.; Pnev, Alexey B.; Karasik, Valeriy E.; Denisov, Lev K.

2018-04-01

Ultrashort pulse (USP) fiber lasers have found applications in such various fields as frequency metrology and spectroscopy, telecommunication systems, etc. For the last decade, mode-locking (ML) fiber lasers have been under carefully investigations for scientific, medical and industrial applications. Also, USP fiber sources can be treated as an ideal platform to expand future applications due to the complex ML nonlinear dynamics with a presence of high value of group velocity dispersion (GVD) and the third order dispersion in the resonator. For more reliable and robust launching of passive mode-locking based on a nonlinear polarization evolution, we used a highly nonlinear germanosilicate fiber (with germanium oxides concentration in the core 50 mol. %) inside the cavity and we have obtained ultrashort stretched pulses with a high peak power and energy. In this work relative intensity noise and frequency repetition stability is improved by applying isolator-polarizer (ISO-PM) with increased extinction ratio Pext and by compensation of intracavity group-velocity dispersion from the value β2 - 0.021 ps2 to - 0.0053 ps2 at 1550 nm. As a result, we have obtained the low-noise stretched pulse generation with duration 180 fs at a repetition rate 11.3 MHz (with signal-tonoise ratio at fundamental frequency 59 dB) with Allan deviation of a pulse repetition frequency for 1 s interval 5,7 * 10-9 and a relative intensity noise < -101 dBc / Hz.

A unified framework for physical print quality

NASA Astrophysics Data System (ADS)

Eid, Ahmed; Cooper, Brian; Rippetoe, Ed

2007-01-01

In this paper we present a unified framework for physical print quality. This framework includes a design for a testbed, testing methodologies and quality measures of physical print characteristics. An automatic belt-fed flatbed scanning system is calibrated to acquire L* data for a wide range of flat field imagery. Testing methodologies based on wavelet pre-processing and spectral/statistical analysis are designed. We apply the proposed framework to three common printing artifacts: banding, jitter, and streaking. Since these artifacts are directional, wavelet based approaches are used to extract one artifact at a time and filter out other artifacts. Banding is characterized as a medium-to-low frequency, vertical periodic variation down the page. The same definition is applied to the jitter artifact, except that the jitter signal is characterized as a high-frequency signal above the banding frequency range. However, streaking is characterized as a horizontal aperiodic variation in the high-to-medium frequency range. Wavelets at different levels are applied to the input images in different directions to extract each artifact within specified frequency bands. Following wavelet reconstruction, images are converted into 1-D signals describing the artifact under concern. Accurate spectral analysis using a DFT with Blackman-Harris windowing technique is used to extract the power (strength) of periodic signals (banding and jitter). Since streaking is an aperiodic signal, a statistical measure is used to quantify the streaking strength. Experiments on 100 print samples scanned at 600 dpi from 10 different printers show high correlation (75% to 88%) between the ranking of these samples by the proposed metrologies and experts' visual ranking.

Basic and Applied Research in the Field of Electronics and Communications

DTIC Science & Technology

1998-02-18

Epitaxy on Semiconductor Surfaces Song, S. Ph.D., 1996 Optical Frequency Metrology Lutwak , R. Ph.D., 1996 Precision Physical Measurements...Systems." J. Opt. Soc. Am. 514(8): 2167-2173 (1997). Lutwak , R., J. Holley, P.P. Chang, S. Paine, D. Kleppner, and T. Ducas. "Circular States of...Domain Analysis of Electromagnetic Interference and Radiation Problems. Ph.D. diss., Dept. of Electr. Eng. and Comput. Sei., MIT, 1995. Lutwak , R

Metrology in physics, chemistry, and biology: differing perceptions.

PubMed

Iyengar, Venkatesh

2007-04-01

The association of physics and chemistry with metrology (the science of measurements) is well documented. For practical purposes, basic metrological measurements in physics are governed by two components, namely, the measure (i.e., the unit of measurement) and the measurand (i.e., the entity measured), which fully account for the integrity of a measurement process. In simple words, in the case of measuring the length of a room (the measurand), the SI unit meter (the measure) provides a direct answer sustained by metrological concepts. Metrology in chemistry, as observed through physical chemistry (measures used to express molar relationships, volume, pressure, temperature, surface tension, among others) follows the same principles of metrology as in physics. The same basis percolates to classical analytical chemistry (gravimetry for preparing high-purity standards, related definitive analytical techniques, among others). However, certain transition takes place in extending the metrological principles to chemical measurements in complex chemical matrices (e.g., food samples), as it adds a third component, namely, indirect measurements (e.g., AAS determination of Zn in foods). This is a practice frequently used in field assays, and calls for additional steps to account for traceability of such chemical measurements for safeguarding reliability concerns. Hence, the assessment that chemical metrology is still evolving.

MSFC Optical Metrology: A National Resource

NASA Technical Reports Server (NTRS)

Burdine, Robert

1998-01-01

A national need exists for Large Diameter Optical Metrology Services. These services include the manufacture, testing, and assurance of precision and control necessary to assure the success of large optical projects. "Best Practices" are often relied on for manufacture and quality controls while optical projects are increasingly more demanding and complex. Marshall Space Flight Center (MSFC) has acquired unique optical measurement, testing and metrology capabilities through active participation in a wide variety of NASA optical programs. An overview of existing optical facilities and metrology capabilities is given with emphasis on use by other optical projects. Cost avoidance and project success is stressed through use of existing MSFC facilities and capabilities for measurement and metrology controls. Current issues in large diameter optical metrology are briefly reviewed. The need for a consistent and long duration Large Diameter Optical Metrology Service Group is presented with emphasis on the establishment of a National Large Diameter Optical Standards Laboratory. Proposals are made to develop MSFC optical standards and metrology capabilities as the primary national standards resource, providing access to MSFC Optical Core Competencies for manufacturers and researchers. Plans are presented for the development of a national lending library of precision optical standards with emphasis on cost avoidance while improving measurement assurance.

Quantum Algorithmic Readout in Multi-Ion Clocks.

PubMed

Schulte, M; Lörch, N; Leroux, I D; Schmidt, P O; Hammerer, K

2016-01-08

Optical clocks based on ensembles of trapped ions promise record frequency accuracy with good short-term stability. Most suitable ion species lack closed transitions, so the clock signal must be read out indirectly by transferring the quantum state of the clock ions to cotrapped logic ions of a different species. Existing methods of quantum logic readout require a linear overhead in either time or the number of logic ions. Here we describe a quantum algorithmic readout whose overhead scales logarithmically with the number of clock ions in both of these respects. The scheme allows a quantum nondemolition readout of the number of excited clock ions using a single multispecies gate operation which can also be used in other areas of ion trap technology such as quantum information processing, quantum simulations, metrology, and precision spectroscopy.

Elements for successful sensor-based process control {Integrated Metrology}

NASA Astrophysics Data System (ADS)

Butler, Stephanie Watts

1998-11-01

Current productivity needs have stimulated development of alternative metrology, control, and equipment maintenance methods. Specifically, sensor applications provide the opportunity to increase productivity, tighten control, reduce scrap, and improve maintenance schedules and procedures. Past experience indicates a complete integrated solution must be provided for sensor-based control to be used successfully in production. In this paper, Integrated Metrology is proposed as the term for an integrated solution that will result in a successful application of sensors for process control. This paper defines and explores the perceived four elements of successful sensor applications: business needs, integration, components, and form. Based upon analysis of existing successful commercially available controllers, the necessary business factors have been determined to be strong, measurable industry-wide business needs whose solution is profitable and feasible. This paper examines why the key aspect of integration is the decision making process. A detailed discussion is provided of the components of most importance to sensor based control: decision-making methods, the 3R's of sensors, and connectivity. A metric for one of the R's (resolution) is proposed to allow focus on this important aspect of measurement. A form for these integrated components which synergistically partitions various aspects of control at the equipment and MES levels to efficiently achieve desired benefits is recommended.

Continuous wave protocol for simultaneous polarization and optical detection of P1-center electron spin resonance

NASA Astrophysics Data System (ADS)

Kamp, E. J.; Carvajal, B.; Samarth, N.

2018-01-01

The ready optical detection and manipulation of bright nitrogen vacancy center spins in diamond plays a key role in contemporary quantum information science and quantum metrology. Other optically dark defects such as substitutional nitrogen atoms (`P1 centers') could also become potentially useful in this context if they could be as easily optically detected and manipulated. We develop a relatively straightforward continuous wave protocol that takes advantage of the dipolar coupling between nitrogen vacancy and P1 centers in type 1b diamond to detect and polarize the dark P1 spins. By combining mutual spin flip transitions with radio frequency driving, we demonstrate the simultaneous optical polarization and detection of the electron spin resonance of the P1 center. This technique should be applicable to detecting and manipulating a broad range of dark spin populations that couple to the nitrogen vacancy center via dipolar fields, allowing for quantum metrology using these spin populations.

An elegant Breadboard of the optical bench for eLISA/NGO

NASA Astrophysics Data System (ADS)

d'Arcio, Luigi; Bogenstahl, Johanna; Diekmann, Christian; Fitzsimons, Ewan D.; Heinzel, Gerhard; Hogenhuis, Harm; Killow, Christian J.; Lieser, Maike; Nikolov, Susanne; Perreur-Lloyd, Michael; Pijnenburg, Joep; Robertson, David I.; Taylor, Alasdair; Tröbs, Michael; Ward, Harry; Weise, Dennis

2017-11-01

The Laser Interferometer Space Antenna, as well as its reformulated European-only evolution, the New Gravitational-Wave Observatory, both employ heterodyne laser interferometry on million kilometer scale arm lengths in a triangular spacecraft formation, to observe gravitational waves at frequencies between 3 × 10-5 Hz and 1 Hz. The Optical Bench as central payload element realizes both the inter-spacecraft as well as local laser metrology with respect to inertial proof masses, and provides further functions, such as point-ahead accommodation, acquisition sensing, transmit beam conditioning, optical power monitoring, and laser redundancy switching. These functions have been combined in a detailed design of an Optical Bench Elegant Breadboard, which is currently under assembly and integration. We present an overview of the realization and current performances of the Optical Bench subsystems, which employ ultraprecise piezo mechanism, ultrastable assembly techniques, and shot noise limited RF detection to achieve translation and tilt metrology at Picometer and Nanoradian noise levels.

Tomographic reconstruction of circularly polarized high-harmonic fields: 3D attosecond metrology

PubMed Central

Chen, Cong; Tao, Zhensheng; Hernández-García, Carlos; Matyba, Piotr; Carr, Adra; Knut, Ronny; Kfir, Ofer; Zusin, Dimitry; Gentry, Christian; Grychtol, Patrik; Cohen, Oren; Plaja, Luis; Becker, Andreas; Jaron-Becker, Agnieszka; Kapteyn, Henry; Murnane, Margaret

2016-01-01

Bright, circularly polarized, extreme ultraviolet (EUV) and soft x-ray high-harmonic beams can now be produced using counter-rotating circularly polarized driving laser fields. Although the resulting circularly polarized harmonics consist of relatively simple pairs of peaks in the spectral domain, in the time domain, the field is predicted to emerge as a complex series of rotating linearly polarized bursts, varying rapidly in amplitude, frequency, and polarization. We extend attosecond metrology techniques to circularly polarized light by simultaneously irradiating a copper surface with circularly polarized high-harmonic and linearly polarized infrared laser fields. The resulting temporal modulation of the photoelectron spectra carries essential phase information about the EUV field. Utilizing the polarization selectivity of the solid surface and by rotating the circularly polarized EUV field in space, we fully retrieve the amplitude and phase of the circularly polarized harmonics, allowing us to reconstruct one of the most complex coherent light fields produced to date. PMID:26989782

Metrological approach to quantitative analysis of clinical samples by LA-ICP-MS: A critical review of recent studies.

PubMed

Sajnóg, Adam; Hanć, Anetta; Barałkiewicz, Danuta

2018-05-15

Analysis of clinical specimens by imaging techniques allows to determine the content and distribution of trace elements on the surface of the examined sample. In order to obtain reliable results, the developed procedure should be based not only on the properly prepared sample and performed calibration. It is also necessary to carry out all phases of the procedure in accordance with the principles of chemical metrology whose main pillars are the use of validated analytical methods, establishing the traceability of the measurement results and the estimation of the uncertainty. This review paper discusses aspects related to sampling, preparation and analysis of clinical samples by laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with emphasis on metrological aspects, i.e. selected validation parameters of the analytical method, the traceability of the measurement result and the uncertainty of the result. This work promotes the introduction of metrology principles for chemical measurement with emphasis to the LA-ICP-MS which is the comparative method that requires studious approach to the development of the analytical procedure in order to acquire reliable quantitative results. Copyright © 2018 Elsevier B.V. All rights reserved.

Surface slope metrology of highly curved x-ray optics with an interferometric microscope

NASA Astrophysics Data System (ADS)

Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

2017-09-01

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Speed scanning system based on solid-state microchip laser for architectural planning

NASA Astrophysics Data System (ADS)

Redka, Dmitriy; Grishkanich, Alexsandr S.; Kolmakov, Egor; Tsvetkov, Konstantin

2017-10-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Coordinate measuring system based on microchip lasers for reverse prototyping

NASA Astrophysics Data System (ADS)

Iakovlev, Alexey; Grishkanich, Alexsandr S.; Redka, Dmitriy; Tsvetkov, Konstantin

2017-02-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Automatic three-dimensional measurement of large-scale structure based on vision metrology.

PubMed

Zhu, Zhaokun; Guan, Banglei; Zhang, Xiaohu; Li, Daokui; Yu, Qifeng

2014-01-01

All relevant key techniques involved in photogrammetric vision metrology for fully automatic 3D measurement of large-scale structure are studied. A new kind of coded target consisting of circular retroreflective discs is designed, and corresponding detection and recognition algorithms based on blob detection and clustering are presented. Then a three-stage strategy starting with view clustering is proposed to achieve automatic network orientation. As for matching of noncoded targets, the concept of matching path is proposed, and matches for each noncoded target are found by determination of the optimal matching path, based on a novel voting strategy, among all possible ones. Experiments on a fixed keel of airship have been conducted to verify the effectiveness and measuring accuracy of the proposed methods.

Study and Optimization of CPT Resonance Parameters in 87 Rb/Ar/Ne Microcells Aimed for Application in Metrology

NASA Astrophysics Data System (ADS)

Masian, Y.; Sivak, A.; Sevostianov, D.; Vassiliev, V.; Velichansky, V.

The paper shows the presents results of studies of small-size rubidium cells with argon and neon buffer gases, produced by a patent pended technique of laser welding [Fishman et al. (2014)]. Cells were designed for miniature frequency standard. Temperature dependence of the frequency of the coherent population trapping (CPT) resonance was measured and used to optimize the ratio of partial pressures of buffer gases. The influence of duration and regime of annealing on the CPT-resonance frequency drift was investigated. The parameters of the FM modulation of laser current for two cases which correspond to the highest amplitude of CPT resonance and to the smallest light shifts of the resonance frequency were determined. The temperature dependences of the CPT resonance frequency were found to be surprisingly different in the two cases. A non-linear dependence of CPT resonance frequency on the temperature of the cell with the two extremes was revealed for one of these cases.

Electric field metrology for SI traceability: Systematic measurement uncertainties in electromagnetically induced transparency in atomic vapor

NASA Astrophysics Data System (ADS)

Holloway, Christopher L.; Simons, Matt T.; Gordon, Joshua A.; Dienstfrey, Andrew; Anderson, David A.; Raithel, Georg

2017-06-01

We investigate the relationship between the Rabi frequency (ΩRF, related to the applied electric field) and Autler-Townes (AT) splitting, when performing atom-based radio-frequency (RF) electric (E) field strength measurements using Rydberg states and electromagnetically induced transparency (EIT) in an atomic vapor. The AT splitting satisfies, under certain conditions, a well-defined linear relationship with the applied RF field amplitude. The EIT/AT-based E-field measurement approach derived from these principles is currently being investigated by several groups around the world as a means to develop a new SI-traceable RF E-field measurement technique. We establish conditions under which the measured AT-splitting is an approximately linear function of the RF electric field. A quantitative description of systematic deviations from the linear relationship is key to exploiting EIT/AT-based atomic-vapor spectroscopy for SI-traceable field measurement. We show that the linear relationship is valid and can be used to determine the E-field strength, with minimal error, as long as the EIT linewidth is small compared to the AT-splitting. We also discuss interesting aspects of the thermal dependence (i.e., hot- versus cold-atom) of this EIT-AT technique. An analysis of the transition from cold- to hot-atom EIT in a Doppler-mismatched cascade system reveals a significant change of the dependence of the EIT linewidth on the optical Rabi frequencies and of the AT-splitting on ΩRF.

Monitoring of multiphase flows for superconducting accelerators and others applications

NASA Astrophysics Data System (ADS)

Filippov, Yu. P.; Kakorin, I. D.; Kovrizhnykh, A. M.; Miklayev, V. M.

2017-07-01

This paper is a review on implementation of measuring systems for two-phase helium, hydrogen, liquefied natural gas (LNG), and oil-formation/salty water flows. Two types of such systems are presented. The first type is based on two-phase flow-meters combining void fraction radio-frequency (RF) sensors and narrowing devices. They can be applied for superconducting accelerators cooled with two-phase helium, refueling hydrogen system for space ships and some applications in oil production industry. The second one is based on combination of a gamma-densitometer and a narrowing device. These systems can be used to monitor large two-phase LNG and oil-formation water flows. An electronics system based on a modular industrial computer is described as well. The metrological characteristics for different flow-meters are presented and the obtained results are discussed. It is also shown that the experience gained allows separationless flow-meter for three-phase oil-gas-formation water flows to be produced.

Sub-Doppler Frequency Metrology in HD for Tests of Fundamental Physics.

PubMed

Cozijn, F M J; Dupré, P; Salumbides, E J; Eikema, K S E; Ubachs, W

2018-04-13

Weak transitions in the (2,0) overtone band of the hydrogen deuteride molecule at λ=1.38  μm were measured in saturated absorption using the technique of noise-immune cavity-enhanced optical heterodyne molecular spectroscopy. Narrow Doppler-free lines were interrogated with a spectroscopy laser locked to a frequency comb laser referenced to an atomic clock to yield transition frequencies [R(1)=217105181895(20)  kHz; R(2)=219042856621(28)  kHz; R(3)=220704304951(28)  kHz] at three orders of magnitude improved accuracy. These benchmark values provide a test of QED in the smallest neutral molecule, and they open up an avenue to resolve the proton radius puzzle, as well as constrain putative fifth forces and extra dimensions.

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

NASA Astrophysics Data System (ADS)

Yacoot, Andrew; Kuetgens, Ulrich

2012-07-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes.

High-intensity therapeutic ultrasound: metrological requirements versus clinical usage

NASA Astrophysics Data System (ADS)

Aubry, J.-F.

2012-10-01

High-intensity therapeutic ultrasound (HITU) is an appealing non-invasive, non-ionizing therapeutic modality with a wide range of tissue interactions ranging from transient permeabilization of cell membranes to thermal ablation. The ability to guide and monitor the treatment with an associated ultrasonic or magnetic resonance imaging device has resulted in a dramatic rise in the clinical use of therapeutic ultrasound in the past two decades. Nevertheless, the range of clinical applications and the number of patients treated has grown at a much higher pace than the definition of standards. In this paper the metrological requirements of the therapeutic beams are reviewed and are compared with the current clinical use of image-guided HITU mostly based on a practical approach. Liver therapy, a particularly challenging clinical application, is discussed to highlight the differences between some complex clinical situations and the experimental conditions of the metrological characterization of ultrasonic transducers.

Metrology of human-based and other qualitative measurements

NASA Astrophysics Data System (ADS)

Pendrill, Leslie; Petersson, Niclas

2016-09-01

The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component Regression, can also be improved by exploiting the increased resolution of the Rasch approach.

Assessment of the present NASA optical metrology capabilities and recommendations for establishing an in-house NASA Optical Metrology Group

NASA Technical Reports Server (NTRS)

Parks, Robert E.

1991-01-01

An investigation into when it was first recognized that there was a deficiency in NASA optical metrology oversight capability, why this deficiency existed unnoticed for so long, and a proposal for correcting the problem is presented. It is explained why this optical metrology oversight is so critical to program success and at the same time, why it is difficult to establish due to the nature of the technology. The solution proposed is the establishment of an Optics Metrology Group within the NASA/MSFC Optics Branch with a line of authority from NASA S & MA.

Metrological AFMs and its application for versatile nano-dimensional metrology tasks

NASA Astrophysics Data System (ADS)

Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

2010-08-01

Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

The frequency-dependent directivity of a planar fabry-perot polymer film ultrasound sensor.

PubMed

Cox, Benjamin T; Beard, Paul C

2007-02-01

A model of the frequency-dependent directivity of a planar, optically-addressed, Fabry-Perot (FP), polymer film ultrasound sensor is described and validated against experimental directivity measurements made over a frequency range of 1 to 15 MHz and angles from normal incidence to 80 degrees. The model may be used, for example, as a predictive tool to improve sensor design, or to provide a noise-free response function that could be deconvolved from sound-field measurements in order to improve accuracy in high-frequency metrology and imaging applications. The specific question of whether effective element sizes as small as the optical-diffraction limit can be achieved was investigated. For a polymer film sensor with a FP cavity of thickness d, the minimum effective element radius was found to be about 0.9 d, and that an illumination spot radius of less than d/4 is required to achieve it.

High stability lasers for lidar and remote sensing

NASA Astrophysics Data System (ADS)

Heine, Frank; Lange, Robert; Seel, Stefan; Smutny, Berry

2017-11-01

Tesat-Spacecom is currently building a set flight models of frequency stabilized lasers for the ESA Missions AEOLUS and LTP. Lasers with low intensity noise in the kHz region and analogue tuning capabilities for frequency and output power are developed for the on board metrology of the LTP project, the precursor mission for LISA. This type of laser is internally stabilized by precise temperature control, approaching an ALLAN variance of 10-9 for 100 sec. It can be easily locked to external frequency references with <50kHz bandwidth. The Seed laser for the AEOLUS mission (wind LIDAR) is used as the master frequency reference and is stabilized internally by a optical cavity. It shows a 3* 10-11 Allan variance from time intervals 1 sec - 1000 sec. Furthermore it is step-tunable for calibration of the receiver instrument with a speed of GHz / sec by a digital command interface. Performance and environmental test results will be presented.

Dual-pump Kerr Micro-cavity Optical Frequency Comb with varying FSR spacing

PubMed Central

Wang, Weiqiang; Chu, Sai T.; Little, Brent E.; Pasquazi, Alessia; Wang, Yishan; Wang, Leiran; Zhang, Wenfu; Wang, Lei; Hu, Xiaohong; Wang, Guoxi; Hu, Hui; Su, Yulong; Li, Feitao; Liu, Yuanshan; Zhao, Wei

2016-01-01

In this paper, we demonstrate a novel dual-pump approach to generate robust optical frequency comb with varying free spectral range (FSR) spacing in a CMOS-compatible high-Q micro-ring resonator (MRR). The frequency spacing of the comb can be tuned by an integer number FSR of the MRR freely in our dual-pump scheme. The dual pumps are self-oscillated in the laser cavity loop and their wavelengths can be tuned flexibly by programming the tunable filter embedded in the cavity. By tuning the pump wavelength, broadband OFC with the bandwidth of >180 nm and the frequency-spacing varying from 6 to 46-fold FSRs is realized at a low pump power. This approach could find potential and practical applications in many areas, such as optical metrology, optical communication, and signal processing systems, for its excellent flexibility and robustness. PMID:27338250

Effect of a timebase mismatch in two-way optical frequency transfer

NASA Astrophysics Data System (ADS)

Tampellini, Anna; Clivati, Cecilia; Levi, Filippo; Mura, Alberto; Calonico, Davide

2017-12-01

Two-way frequency transfer on optical fibers is a powerful technique for the comparison of distant clocks over long and ultra-long hauls. In contrast to traditional Doppler noise cancellation, it is capable of sustaining higher link attenuation, mitigating the need of optical amplification and regeneration and thus reducing the setup complexity. We investigate the ultimate limitations of the two-way approach on a 300 km multiplexed fiber haul, considering fully independent setups and acquisition systems at the two link ends. We derive a theoretical model to predict the performance deterioration due to a bad synchronisation of the measurements, which is confirmed by experimental results. This study demonstrates that two-way optical frequency transfer is a reliable and performing technique, capable of sustaining remote clocks comparisons at the 10-19 resolution, and is relevant for the development of a fiber network of continental scale for frequency metrology in Europe.

Report on key comparison COOMET.AUV.A-K5: pressure calibration of laboratory standard microphones in the frequency range 2 Hz to 10 kHz

NASA Astrophysics Data System (ADS)

Dobrowolska, D.; Kosterov, A.

2016-01-01

This is the final report for regional key comparison COOMET.AUV.A-K5 on the pressure calibration of laboratory standard microphones in the frequency range from 2 Hz to 10 kHz. Two laboratories—Central Office of Measures (GUM)—the national metrology institute for Poland and the State Enterprise Scientific-Research Institute for Metrology of Measurement and Control Systems (DP NDI Systema)— the designated institute for acoustics in Ukraine took part in this comparison with the GUM as a pilot. One travelling type LS1P microphone was circulated to the participants and results in the form of regular calibration certificates were collected. The results of the DP NDI Systema obtained in this comparison were linked to the CCAUV.A-K5 key comparison through the joint participation of the GUM. The degrees of equivalence were computed for DP NDI Systema with respect to the CCAUV.A-K5 key comparison reference value. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

INTERNATIONAL NEWS: CPEM 2006 round table discussion 'Proposed changes to the SI'

NASA Astrophysics Data System (ADS)

Stock, Michael; Witt, Thomas J.

2006-12-01

This report summarizes a round table session held last July at the CPEM 2006 to discuss recently proposed redefinitions of some base units of the International System of Units (SI) based on defined values of some fundamental constants. The aim of the session was to inform CPEM delegates of the various proposals and to promote a wide discussion of the issues arising from them. An interdisciplinary panel of six experts from national metrology institutes, the academic community and the industrial metrology community briefly presented their views and their concerns. The presentations were followed by a session in which the panel answered questions and heard comments from the audience.

Research on rapid agile metrology for manufacturing based on real-time multitask operating system

NASA Astrophysics Data System (ADS)

Chen, Jihong; Song, Zhen; Yang, Daoshan; Zhou, Ji; Buckley, Shawn

1996-10-01

Rapid agile metrology for manufacturing (RAMM) using multiple non-contact sensors is likely to remain a growing trend in manufacturing. High speed inspecting systems for manufacturing is characterized by multitasks implemented in parallel and real-time events which occur simultaneously. In this paper, we introduce a real-time operating system into RAMM research. A general task model of a class-based object- oriented technology is proposed. A general multitask frame of a typical RAMM system using OPNet is discussed. Finally, an application example of a machine which inspects parts held on a carrier strip is described. With RTOS and OPNet, this machine can measure two dimensions of the contacts at 300 parts/second.

Diffraction based overlay metrology for α-carbon applications

NASA Astrophysics Data System (ADS)

Saravanan, Chandra Saru; Tan, Asher; Dasari, Prasad; Goelzer, Gary; Smith, Nigel; Woo, Seouk-Hoon; Shin, Jang Ho; Kang, Hyun Jae; Kim, Ho Chul

2008-03-01

Applications that require overlay measurement between layers separated by absorbing interlayer films (such as α- carbon) pose significant challenges for sub-50nm processes. In this paper scatterometry methods are investigated as an alternative to meet these stringent overlay metrology requirements. In this article, a spectroscopic Diffraction Based Overlay (DBO) measurement technique is used where registration errors are extracted from specially designed diffraction targets. DBO measurements are performed on detailed set of wafers with varying α-carbon (ACL) thicknesses. The correlation in overlay values between wafers with varying ACL thicknesses will be discussed. The total measurement uncertainty (TMU) requirements for these layers are discussed and the DBO TMU results from sub-50nm samples are reviewed.

Metrology system for the Terrestrial Planet Finder Coronagraph

NASA Technical Reports Server (NTRS)

Shaklin, Stuart; Marchen, Luis; Zhao, Feng; Peters, Robert D.; Ho, Tim; Holmes, Buck

2004-01-01

The Terrestrial Planet Finder (TPF) employs an aggressive coronagraph designed to obtain better than 1e-10 contrast inside the third Airy ring. Minute changes in low-order aberration content scatter significant light at this position. One implication is the requirement to control low-order aberrations induced by motion of the secondary mirror relative to the primary mirror; sub-nanometer relative positional stability is required. We propose a 6-beam laser truss to monitor the relative positions of the two mirrors. The truss is based on laser metrology developed for the Space Interferometry Mission.

Optical Fabrication and Measurement AXAF and CIRS

NASA Technical Reports Server (NTRS)

Engelhaupt, Darell

1997-01-01

This paper presents a final report on Optical Fabrication and Measurement AXAF (Advanced X-Ray Astrophysics Facility) and CIRS (Composite Infrared Spectrometer) from July 12, 1994 to August 16, 1996.. This paper includes specific tasks to be performed. The tasks are as follows: 1) Preparation and Characterization of Zerodur Glass Samples; 2) Develop and Fabricate AXAF and CIRS Metrology Tooling; 3) Update AXAF Technical Data Base; and 4) Perform Fabrication Related Metrology Tasks for CIRS. This paper also includes final activities from the July, 1996 report to August 1996.

PREFACE: 13th International Conference on Metrology and Properties of Engineering Surfaces

NASA Astrophysics Data System (ADS)

Leach, Richard

2011-08-01

The 13th International Conference on Metrology and Properties of Engineering Surfaces focused on the progress in surface metrology, surface characterisation instrumentation and properties of engineering surfaces. The conference provided an international forum for academics, industrialists and engineers from different disciplines to meet and exchange their ideas, results and latest research. The conference was held at Twickenham Stadium, situated approximately six miles from Heathrow Airport and approximately three miles from the National Physical Laboratory (NPL). This was the thirteenth in the very successful series of conferences, which have firmly established surface topography as a new and exciting interdisciplinary field of scientific and technological studies. Scientific Themes: Surface, Micro and Nano Metrology Measurement and Instrumentation Metrology for MST Devices Freeform Surface Measurement and Characterisation Uncertainty, Traceability and Calibration AFM/SPM Metrology Tribology and Wear Phenomena Functional Applications Stylus and Optical Instruments

Entanglement-enhanced quantum metrology in a noisy environment

NASA Astrophysics Data System (ADS)

Wang, Kunkun; Wang, Xiaoping; Zhan, Xiang; Bian, Zhihao; Li, Jian; Sanders, Barry C.; Xue, Peng

2018-04-01

Quantum metrology overcomes standard precision limits and plays a central role in science and technology. Practically, it is vulnerable to imperfections such as decoherence. Here we demonstrate quantum metrology for noisy channels such that entanglement with ancillary qubits enhances the quantum Fisher information for phase estimation but not otherwise. Our photonic experiment covers a range of noise for various types of channels, including for two randomly alternating channels such that assisted entanglement fails for each noisy channel individually. We simulate noisy channels by implementing space-multiplexed dual interferometers with quantum photonic inputs. We demonstrate the advantage of entanglement-assisted protocols in a phase estimation experiment run with either a single-probe or multiprobe approach. These results establish that entanglement with ancillae is a valuable approach for delivering quantum-enhanced metrology. Our approach to entanglement-assisted quantum metrology via a simple linear-optical interferometric network with easy-to-prepare photonic inputs provides a path towards practical quantum metrology.

A Roadmap for Thermal Metrology

NASA Astrophysics Data System (ADS)

Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

2009-02-01

A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

Developing Stabilized Lasers, Measuring their Frequencies, demoting the Metre, inventing the Comb, and further consequences

NASA Astrophysics Data System (ADS)

Hall, John L.

2010-02-01

Michelson's 1907 proposal to define the SI Metre in terms of an optical wavelength was realized only in 1960, based on a ^86Krypton discharge lamp. The same year saw the cw HeNe laser arrive and a future redefinition based on laser technology assured. Separation in the late 60's of the laser's gain and spectral-reference-gas functions led to unprecedented levels of laser frequency stability and reproducibility. In addition to HeNe:CH4 system at 3392 nm and HeNe:I2 at 633 nm, systems at 514 nm and 10600 nm were studied. Absolute frequency measurement became the holy grail and some NBS team experiences will be shared. We measured both frequency and wavelength in 1972, and so obtained a speed of light value, improved 100-fold in accuracy. During the next decade, the NBS value of c was confirmed by other national labs, and frequency metrology was extended to the 473 THz (633 nm) Iodine-based wavelength standard. This frequency to ˜10 digit accuracy was obtained in 1983, thus setting the stage for redefining the SI Metre. By consensus choice the value 299 792 458 m/s was adopted for the speed of light, effectively reducing the Metre to a derived SI quantity. Knowledge of the frequency of the particular laser being utilized was controlled by International intercomparisons, but the need for a fast and accurate means to make these laser frequency measurements was obvious. Creative proposals by H"ansch and by Chebotayev were to use ultra-fast repetitive pulses to create an ``Optical Comb,'' but it was years before any technical basis existed to implement their Fourier dreams. Finally, in 1999 the last needed capability was demonstrated -- continuum production at 100 MHz rates and non-destructive power levels. By May 2000 phase-locked combs were operational in both Garching and Boulder, substantially accelerated by their collaborative interactions. Within 18 months all the known proposed ``optical frequency standards'' had been accurately measured via Comb techniques. )

Ultrafast dynamics and stabilization in chip-scale optical frequency combs (Conference Presentation)

NASA Astrophysics Data System (ADS)

Huang, Shu Wei

2017-02-01

Optical frequency comb technology has been the cornerstone for scientific breakthroughs such as precision frequency metrology, re-definition of time, extreme light-matter interaction, and attosecond sciences. Recently emerged Kerr-active microresonators are promising alternatives to the current benchmark femtosecond laser platform. These chip-scale frequency combs, or Kerr combs, are unique in their compact footprints and offer the potential for monolithic electronic and feedback integration, thereby expanding the already remarkable applications of optical frequency combs. In this talk, I will first report the generation and characterization of low-phase-noise Kerr frequency combs. Measurements of the Kerr comb ultrafast dynamics and phase noise will be presented and discussed. Then I will describe novel strategies to fully stabilize Kerr comb line frequencies towards chip-scale optical frequency synthesizers with a relative uncertainty better than 2.7×10-16. I will show that the unique generation physics of Kerr frequency comb can provide an intrinsic self-referenced access to the Kerr comb line frequencies. The strategy improves the optical frequency stability by more than two orders of magnitude, while preserving the Kerr comb's key advantage of low SWaP and potential for chip-scale electronic and photonic integration.

An image-processing software package: UU and Fig for optical metrology applications

NASA Astrophysics Data System (ADS)

Chen, Lujie

2013-06-01

Modern optical metrology applications are largely supported by computational methods, such as phase shifting [1], Fourier Transform [2], digital image correlation [3], camera calibration [4], etc, in which image processing is a critical and indispensable component. While it is not too difficult to obtain a wide variety of image-processing programs from the internet; few are catered for the relatively special area of optical metrology. This paper introduces an image-processing software package: UU (data processing) and Fig (data rendering) that incorporates many useful functions to process optical metrological data. The cross-platform programs UU and Fig are developed based on wxWidgets. At the time of writing, it has been tested on Windows, Linux and Mac OS. The userinterface is designed to offer precise control of the underline processing procedures in a scientific manner. The data input/output mechanism is designed to accommodate diverse file formats and to facilitate the interaction with other independent programs. In terms of robustness, although the software was initially developed for personal use, it is comparably stable and accurate to most of the commercial software of similar nature. In addition to functions for optical metrology, the software package has a rich collection of useful tools in the following areas: real-time image streaming from USB and GigE cameras, computational geometry, computer vision, fitting of data, 3D image processing, vector image processing, precision device control (rotary stage, PZT stage, etc), point cloud to surface reconstruction, volume rendering, batch processing, etc. The software package is currently used in a number of universities for teaching and research.

A curved edge diffraction-utilized displacement sensor for spindle metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lee, ChaBum, E-mail: clee@tntech.edu; Zhao, Rui; Jeon, Seongkyul

This paper presents a new dimensional metrological sensing principle for a curved surface based on curved edge diffraction. Spindle error measurement technology utilizes a cylindrical or spherical target artifact attached to the spindle with non-contact sensors, typically a capacitive sensor (CS) or an eddy current sensor, pointed at the artifact. However, these sensors are designed for flat surface measurement. Therefore, measuring a target with a curved surface causes error. This is due to electric fields behaving differently between a flat and curved surface than between two flat surfaces. In this study, a laser is positioned incident to the cylindrical surfacemore » of the spindle, and a photodetector collects the total field produced by the diffraction around the target surface. The proposed sensor was compared with a CS within a range of 500 μm. The discrepancy between the proposed sensor and CS was 0.017% of the full range. Its sensing performance showed a resolution of 14 nm and a drift of less than 10 nm for 7 min of operation. This sensor was also used to measure dynamic characteristics of the spindle system (natural frequency 181.8 Hz, damping ratio 0.042) and spindle runout (22.0 μm at 2000 rpm). The combined standard uncertainty was estimated as 85.9 nm under current experiment conditions. It is anticipated that this measurement technique allows for in situ health monitoring of a precision spindle system in an accurate, convenient, and low cost manner.« less

Adaptive x-ray optics development at AOA-Xinetics

NASA Astrophysics Data System (ADS)

Lillie, Charles F.; Cavaco, Jeff L.; Brooks, Audrey D.; Ezzo, Kevin; Pearson, David D.; Wellman, John A.

2013-05-01

Grazing-incidence optics for X-ray applications require extremely smooth surfaces with precise mirror figures to provide well focused beams and small image spot sizes for astronomical telescopes and laboratory test facilities. The required precision has traditionally been achieved by time-consuming grinding and polishing of thick substrates with frequent pauses for precise metrology to check the mirror figure. More recently, substrates with high quality surface finish and figures have become available at reasonable cost, and techniques have been developed to mechanically adjust the figure of these traditionally polished substrates for ground-based applications. The beam-bending techniques currently in use are mechanically complex, however, with little control over mid-spatial frequency errors. AOA-Xinetics has been developing been developing techniques for shaping grazing incidence optics with surface-normal and surface-parallel electrostrictive Lead magnesium niobate (PMN) actuators bonded to mirror substrates for several years. These actuators are highly reliable; exhibit little to no hysteresis, aging or creep; and can be closely spaced to correct low and mid-spatial frequency errors in a compact package. In this paper we discuss recent development of adaptive x-ray optics at AOA-Xinetics.

Adaptive x-ray optics development at AOA-Xinetics

NASA Astrophysics Data System (ADS)

Lillie, Charles F.; Pearson, David D.; Cavaco, Jeffrey L.; Plinta, Audrey D.; Wellman, John A.

2012-10-01

Grazing-incidence optics for X-ray applications require extremely smooth surfaces with precise mirror figures to provide well focused beams and small image spot sizes for astronomical telescopes and laboratory test facilities. The required precision has traditionally been achieved by time-consuming grinding and polishing of thick substrates with frequent pauses for precise metrology to check the mirror figure. More recently, substrates with high quality surface finish and figures have become available at reasonable cost, and techniques have been developed to mechanically adjust the figure of these traditionally polished substrates for ground-based applications. The beam-bending techniques currently in use are mechanically complex, however, with little control over mid-spatial frequency errors. AOA-Xinetics has been developing been developing techniques for shaping grazing incidence optics with surface-normal and surface-parallel electrostrictive Lead magnesium niobate (PMN) actuators bonded to mirror substrates for several years. These actuators are highly reliable; exhibit little to no hysteresis, aging or creep; and can be closely spaced to correct low and mid-spatial frequency errors in a compact package. In this paper we discuss recent development of adaptive x-ray optics at AOAXinetics.

Assessing the Economic and National Security Benefits from Publicly Funded Technology Investments: An IDA Round Table.

DTIC Science & Technology

1995-09-01

strong commitment today, as in the past, is that of metrology —the science and technology of measurement. Metrology has applications in the areas of...problem- solving approach: NIST has earned a worldwide reputation for impartiality and techni- cal excellence. Its competencies in metrology —the science... metrological development5 NIST’s evaluations of industry’s technology needs indicate widespread demand for enhanced measurement capabilities, and

Six-Port Based Interferometry for Precise Radar and Sensing Applications

PubMed Central

Koelpin, Alexander; Lurz, Fabian; Linz, Sarah; Mann, Sebastian; Will, Christoph; Lindner, Stefan

2016-01-01

Microwave technology plays a more important role in modern industrial sensing applications. Pushed by the significant progress in monolithic microwave integrated circuit technology over the past decades, complex sensing systems operating in the microwave and even millimeter-wave range are available for reasonable costs combined with exquisite performance. In the context of industrial sensing, this stimulates new approaches for metrology based on microwave technology. An old measurement principle nearly forgotten over the years has recently gained more and more attention in both academia and industry: the six-port interferometer. This paper reviews the basic concept, investigates promising applications in remote, as well as contact-based sensing and compares the system with state-of-the-art metrology. The significant advantages will be discussed just as the limitations of the six-port architecture. Particular attention will be paid to impairment effects and non-ideal behavior, as well as compensation and linearization concepts. It will be shown that in application fields, like remote distance sensing, precise alignment measurements, as well as interferometrically-evaluated mechanical strain analysis, the six-port architecture delivers extraordinary measurement results combined with high measurement data update rates for reasonable system costs. This makes the six-port architecture a promising candidate for industrial metrology. PMID:27669246

A European Roadmap for Thermophysical Properties Metrology

NASA Astrophysics Data System (ADS)

Filtz, J.-R.; Wu, J.; Stacey, C.; Hollandt, J.; Monte, C.; Hay, B.; Hameury, J.; Villamañan, M. A.; Thurzo-Andras, E.; Sarge, S.

2015-03-01

A roadmap for thermophysical properties metrology was developed in spring 2011 by the Thermophysical Properties Working Group in the EURAMET Technical Committee in charge of Thermometry, Humidity and Moisture, and Thermophysical Properties metrology. This roadmapping process is part of the EURAMET (European Association of National Metrology Institutes) activities aiming to increase impact from national investment in European metrology R&D. The roadmap shows a shared vision of how the development of thermophysical properties metrology should be oriented over the next 15 years to meet future social and economic needs. Since thermophysical properties metrology is a very broad and varied field, the authors have limited this roadmap to the following families of properties: thermal transport properties (thermal conductivity, thermal diffusivity, etc.), radiative properties (emissivity, absorbance, reflectance, and transmittance), caloric quantities (specific heat, enthalpy, etc.), thermodynamic properties (PVT and phase equilibria properties), and temperature-dependent quantities (thermal expansion, compressibility, etc.). This roadmap identifies the main societal and economical triggers that drive developments in thermophysical properties metrology. The key topics considered are energy, environment, advanced manufacturing and processing, public safety, security, and health. Key targets that require improved thermophysical properties measurements are identified in order to address these triggers. Ways are also proposed for defining the necessary skills and the main useful means to be implemented. These proposals will have to be revised as needs and technologies evolve in the future.

Easy parallel screening of reagent stability, quality control, and metrology in solid phase peptide synthesis (SPPS) and peptide couplings for microarrays

DOE Office of Scientific and Technical Information (OSTI.GOV)

Achyuthan, Komandoor E.; Wheeler, David R.

Evaluating the stability of coupling reagents, quality control (QC), and surface functionalization metrology are all critical to the production of high quality peptide microarrays. We describe a broadly applicable screening technique for evaluating the fidelity of solid phase peptide synthesis (SPPS), the stability of activation/coupling reagents, and a microarray surface metrology tool. This technique was used to assess the stability of the activation reagent 1-{[1-(Cyano-2-ethoxy-2-oxo-ethylidenaminooxy)dimethylamino-morpholinomethylene]}methaneaminiumHexafluorophosphate (COMU) (Sigma-Aldrich, St. Louis, MO, USA) by SPPS of Leu-Enkephalin (YGGFL) or the coupling of commercially synthesized YGGFL peptides to (3-aminopropyl)triethyoxysilane-modified glass surfaces. Coupling efficiency was quantitated by fluorescence signaling based on immunoreactivity of themore » YGGFL motif. It was concluded that COMU solutions should be prepared fresh and used within 5 h when stored at ~23 °C and not beyond 24 h if stored refrigerated, both in closed containers. Caveats to gauging COMU stability by absorption spectroscopy are discussed. Commercial YGGFL peptides needed independent QC, due to immunoreactivity variations for the same sequence synthesized by different vendors. This technique is useful in evaluating the stability of other activation/coupling reagents besides COMU and as a metrology tool for SPPS and peptide microarrays.« less

Easy parallel screening of reagent stability, quality control, and metrology in solid phase peptide synthesis (SPPS) and peptide couplings for microarrays

DOE PAGES

Achyuthan, Komandoor E.; Wheeler, David R.

2015-08-27

Evaluating the stability of coupling reagents, quality control (QC), and surface functionalization metrology are all critical to the production of high quality peptide microarrays. We describe a broadly applicable screening technique for evaluating the fidelity of solid phase peptide synthesis (SPPS), the stability of activation/coupling reagents, and a microarray surface metrology tool. This technique was used to assess the stability of the activation reagent 1-{[1-(Cyano-2-ethoxy-2-oxo-ethylidenaminooxy)dimethylamino-morpholinomethylene]}methaneaminiumHexafluorophosphate (COMU) (Sigma-Aldrich, St. Louis, MO, USA) by SPPS of Leu-Enkephalin (YGGFL) or the coupling of commercially synthesized YGGFL peptides to (3-aminopropyl)triethyoxysilane-modified glass surfaces. Coupling efficiency was quantitated by fluorescence signaling based on immunoreactivity of themore » YGGFL motif. It was concluded that COMU solutions should be prepared fresh and used within 5 h when stored at ~23 °C and not beyond 24 h if stored refrigerated, both in closed containers. Caveats to gauging COMU stability by absorption spectroscopy are discussed. Commercial YGGFL peptides needed independent QC, due to immunoreactivity variations for the same sequence synthesized by different vendors. This technique is useful in evaluating the stability of other activation/coupling reagents besides COMU and as a metrology tool for SPPS and peptide microarrays.« less

Overlay improvements using a real time machine learning algorithm

NASA Astrophysics Data System (ADS)

Schmitt-Weaver, Emil; Kubis, Michael; Henke, Wolfgang; Slotboom, Daan; Hoogenboom, Tom; Mulkens, Jan; Coogans, Martyn; ten Berge, Peter; Verkleij, Dick; van de Mast, Frank

2014-04-01

While semiconductor manufacturing is moving towards the 14nm node using immersion lithography, the overlay requirements are tightened to below 5nm. Next to improvements in the immersion scanner platform, enhancements in the overlay optimization and process control are needed to enable these low overlay numbers. Whereas conventional overlay control methods address wafer and lot variation autonomously with wafer pre exposure alignment metrology and post exposure overlay metrology, we see a need to reduce these variations by correlating more of the TWINSCAN system's sensor data directly to the post exposure YieldStar metrology in time. In this paper we will present the results of a study on applying a real time control algorithm based on machine learning technology. Machine learning methods use context and TWINSCAN system sensor data paired with post exposure YieldStar metrology to recognize generic behavior and train the control system to anticipate on this generic behavior. Specific for this study, the data concerns immersion scanner context, sensor data and on-wafer measured overlay data. By making the link between the scanner data and the wafer data we are able to establish a real time relationship. The result is an inline controller that accounts for small changes in scanner hardware performance in time while picking up subtle lot to lot and wafer to wafer deviations introduced by wafer processing.

XPS-XRF hybrid metrology enabling FDSOI process

NASA Astrophysics Data System (ADS)

Hossain, Mainul; Subramanian, Ganesh; Triyoso, Dina; Wahl, Jeremy; Mcardle, Timothy; Vaid, Alok; Bello, A. F.; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Pois, Heath; Wang, Ying; Larson, Tom

2016-03-01

Planar fully-depleted silicon-on-insulator (FDSOI) technology potentially offers comparable transistor performance as FinFETs. pFET FDOSI devices are based on a silicon germanium (cSiGe) layer on top of a buried oxide (BOX). Ndoped interfacial layer (IL), high-k (HfO2) layer and the metal gate stacks are then successively built on top of the SiGe layer. In-line metrology is critical in precisely monitoring the thickness and composition of the gate stack and associated underlying layers in order to achieve desired process control. However, any single in-line metrology technique is insufficient to obtain the thickness of IL, high-k, cSiGe layers in addition to Ge% and N-dose in one single measurement. A hybrid approach is therefore needed that combines the capabilities of more than one measurement technique to extract multiple parameters in a given film stack. This paper will discuss the approaches, challenges, and results associated with the first-in-industry implementation of XPS-XRF hybrid metrology for simultaneous detection of high-k thickness, IL thickness, N-dose, cSiGe thickness and %Ge, all in one signal measurement on a FDSOI substrate in a manufacturing fab. Strong correlation to electrical data for one or more of these measured parameters will also be presented, establishing the reliability of this technique.

Metrology in electricity and magnetism: EURAMET activities today and tomorrow

NASA Astrophysics Data System (ADS)

Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

2017-10-01

Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

Sympathetic Cooling of Molecular Ions in Selected Rotational and Vibrational States Produced by Threshold Photoionization

NASA Astrophysics Data System (ADS)

Tong, Xin; Winney, Alexander H.; Willitsch, Stefan

2010-10-01

We present a new method for the generation of rotationally and vibrationally state-selected, translationally cold molecular ions in ion traps. Our technique is based on the state-selective threshold photoionization of neutral molecules followed by sympathetic cooling of the resulting ions with laser-cooled calcium ions. Using N2+ ions as a test system, we achieve >90% selectivity in the preparation of the ground rovibrational level and state lifetimes on the order of 15 minutes limited by collisions with background-gas molecules. The technique can be employed to produce a wide range of apolar and polar molecular ions in the ground and excited rovibrational states. Our approach opens up new perspectives for cold quantum-controlled ion-molecule-collision studies, frequency-metrology experiments with state-selected molecular ions and molecular-ion qubits.

CODATA recommended values of the fundamental constants

NASA Astrophysics Data System (ADS)

Mohr, Peter J.; Taylor, Barry N.

2000-11-01

A review is given of the latest Committee on Data for Science and Technology (CODATA) adjustment of the values of the fundamental constants. The new set of constants, referred to as the 1998 values, replaces the values recommended for international use by CODATA in 1986. The values of the constants, and particularly the Rydberg constant, are of relevance to the calculation of precise atomic spectra. The standard uncertainty (estimated standard deviation) of the new recommended value of the Rydberg constant, which is based on precision frequency metrology and a detailed analysis of the theory, is approximately 1/160 times the uncertainty of the 1986 value. The new set of recommended values as well as a searchable bibliographic database that gives citations to the relevant literature is available on the World Wide Web at physics.nist.gov/constants and physics.nist.gov/constantsbib, respectively. .

Study and characterization of a MEMS micromirror device

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Pryputniewicz, Ryszard J.

2004-08-01

In this paper, advances in our study and characterization of a MEMS micromirror device are presented. The micromirror device, of 510 mm characteristic length, operates in a dynamic mode with a maximum displacement on the order of 10 mm along its principal optical axis and oscillation frequencies of up to 1.3 kHz. Developments are carried on by analytical, computational, and experimental methods. Analytical and computational nonlinear geometrical models are developed in order to determine the optimal loading-displacement operational characteristics of the micromirror. Due to the operational mode of the micromirror, the experimental characterization of its loading-displacement transfer function requires utilization of advanced optical metrology methods. Optoelectronic holography (OEH) methodologies based on multiple wavelengths that we are developing to perform such characterization are described. It is shown that the analytical, computational, and experimental approach is effective in our developments.

Electrical test prediction using hybrid metrology and machine learning

NASA Astrophysics Data System (ADS)

Breton, Mary; Chao, Robin; Muthinti, Gangadhara Raja; de la Peña, Abraham A.; Simon, Jacques; Cepler, Aron J.; Sendelbach, Matthew; Gaudiello, John; Emans, Susan; Shifrin, Michael; Etzioni, Yoav; Urenski, Ronen; Lee, Wei Ti

2017-03-01

Electrical test measurement in the back-end of line (BEOL) is crucial for wafer and die sorting as well as comparing intended process splits. Any in-line, nondestructive technique in the process flow to accurately predict these measurements can significantly improve mean-time-to-detect (MTTD) of defects and improve cycle times for yield and process learning. Measuring after BEOL metallization is commonly done for process control and learning, particularly with scatterometry (also called OCD (Optical Critical Dimension)), which can solve for multiple profile parameters such as metal line height or sidewall angle and does so within patterned regions. This gives scatterometry an advantage over inline microscopy-based techniques, which provide top-down information, since such techniques can be insensitive to sidewall variations hidden under the metal fill of the trench. But when faced with correlation to electrical test measurements that are specific to the BEOL processing, both techniques face the additional challenge of sampling. Microscopy-based techniques are sampling-limited by their small probe size, while scatterometry is traditionally limited (for microprocessors) to scribe targets that mimic device ground rules but are not necessarily designed to be electrically testable. A solution to this sampling challenge lies in a fast reference-based machine learning capability that allows for OCD measurement directly of the electrically-testable structures, even when they are not OCD-compatible. By incorporating such direct OCD measurements, correlation to, and therefore prediction of, resistance of BEOL electrical test structures is significantly improved. Improvements in prediction capability for multiple types of in-die electrically-testable device structures is demonstrated. To further improve the quality of the prediction of the electrical resistance measurements, hybrid metrology using the OCD measurements as well as X-ray metrology (XRF) is used. Hybrid metrology is the practice of combining information from multiple sources in order to enable or improve the measurement of one or more critical parameters. Here, the XRF measurements are used to detect subtle changes in barrier layer composition and thickness that can have second-order effects on the electrical resistance of the test structures. By accounting for such effects with the aid of the X-ray-based measurements, further improvement in the OCD correlation to electrical test measurements is achieved. Using both types of solution incorporation of fast reference-based machine learning on nonOCD-compatible test structures, and hybrid metrology combining OCD with XRF technology improvement in BEOL cycle time learning could be accomplished through improved prediction capability.

A Faraday laser lasing on Rb 1529 nm transition.

PubMed

Chang, Pengyuan; Peng, Huanfa; Zhang, Shengnan; Chen, Zhangyuan; Luo, Bin; Chen, Jingbiao; Guo, Hong

2017-08-21

We present the design and performance characterization of a Faraday laser directly lasing on the Rb 1529 nm transition (Rb, 5P 3/2  - 4D 5/2 ) with high stability, narrow spectral linewidth and low cost. This system does not need an additional frequency-stabilized pump laser as a prerequisite to preparing Rb atom from 5S to 5P excited state. Just by using a performance-improved electrodeless discharge lamp-based excited-state Faraday anomalous dispersion optical filter (LESFADOF), we realized a heterogeneously Faraday laser with the frequency corresponding to atomic transition, working stably over a range of laser diode (LD) current from 85 mA to 171 mA and the LD temperature from 11 °C to 32 °C, as well as the 24-hour long-term frequency fluctuation range of no more than 600 MHz. Both the laser linewidth and relative intensity noisy (RIN) are measured. The Faraday laser lasing on Rb 1529 nm transition (telecom C-band) can be applied to further research on metrology, microwave photonics and optical communication systems. Besides, since the transitions correspongding to the populated excited-states of alkali atoms within lamp are extraordinarily rich, this scheme can increase the flexibility for choosing proper wavelengths for Faraday laser and greatly expand the coverage of wavelength corresponding to atomic transmission for laser frequency stabilization.

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Macdonald, Daniel R.; Diaz, Rosemary T.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission were used to search for locally anisotropic space-time, with a null result at the 10 to the negative tenth power level.

Test Evaluation and Modification of Prototype Rotating Gravity Gradiometer

DTIC Science & Technology

1975-07-01

RECOMMENEATIONS 3 4.0 BEARINGS 6 4.1 Design 6 4.2 Metrology 6 4.3 Preassembly 14 5.0 TEST RIG 17 5.1 Design 17 5.2 Metrology 21 5.3 Assembly and...print requirements of 5 \\i inches TIR max. However, because of available (stare-of-the-art) metrology equipment limitations, no conclusion as to...gravity gradiometer are contained in Shaker Research Corporation drawing series 101 (see Appendix I), 4.2 Metrology The production of the

Femtosecond Lasers with Diode Pumping for Using in Precision Metrology and Optical Fiber Communication

DTIC Science & Technology

2008-11-24

folding angle of 32° to compensate astigmatism of the Brewster -cut Cr:F crystal. The gain crystal was 17 mm long and introduced positive group-delay...accomplished. For complete stabilization of the femtosecond comb one needs to control its absolute frequency. To realize this we use either angle - tilted...Kerr- lens mode-locking. To the best of our knowledge there is no published works on KLM ytterbium femtosecond lasers with multimode pumping. Stable

TWSTFT Network Status in the Pacific Rim Region and Development of a New Time Transfer Modem for TWSTFT

DTIC Science & Technology

2000-01-01

32nd Annual Precise T ime and Time Interval ( P T T I ) Meeting TWSTFT NETWORK STATUS IN THE PACIFIC RIM REGION AND DEVELOPMENT OF A NEW TIME...TRANSFER MODEM FOR TWSTFT M. Imael, M. Hosokawal, Y . Hanadol, 2. Li2, P. Fisk3, Y . Nakadan4, and C. S. Liao5 ’Communications Research Laboratory...Metrology (NRLM), Japan 5Telecommunication Laboratories (TL) , Taipei, Taiwan Abstract Iko-Way Satellite Time and Frequency Transfer ( TWSTFT ) is one

High-frequency and high-quality silicon carbide optomechanical microresonators

PubMed Central

Lu, Xiyuan; Lee, Jonathan Y.; Lin, Qiang

2015-01-01

Silicon carbide (SiC) exhibits excellent material properties attractive for broad applications. We demonstrate the first SiC optomechanical microresonators that integrate high mechanical frequency, high mechanical quality, and high optical quality into a single device. The radial-breathing mechanical mode has a mechanical frequency up to 1.69 GHz with a mechanical Q around 5500 in atmosphere, which corresponds to a fm · Qm product as high as 9.47 × 1012 Hz. The strong optomechanical coupling allows us to efficiently excite and probe the coherent mechanical oscillation by optical waves. The demonstrated devices, in combination with the superior thermal property, chemical inertness, and defect characteristics of SiC, show great potential for applications in metrology, sensing, and quantum photonics, particularly in harsh environments that are challenging for other device platforms. PMID:26585637

Coupled optical resonance laser locking.

PubMed

Burd, S C; du Toit, P J W; Uys, H

2014-10-20

We have demonstrated simultaneous laser frequency stabilization of a UV and IR laser, to coupled transitions of ions in the same spectroscopic sample, by detecting only the absorption of the UV laser. Separate signals for locking the different lasers are obtained by modulating each laser at a different frequency and using lock-in detection of a single photodiode signal. Experimentally, we simultaneously lock a 369 nm and a 935 nm laser to the (2)S(1/2) → (2)(P(1/2) and (2)D(3/2) → (3)D([3/2]1/2) transitions, respectively, of Yb(+) ions generated in a hollow cathode discharge lamp. Stabilized lasers at these frequencies are required for cooling and trapping Yb(+) ions, used in quantum information and in high precision metrology experiments. This technique should be readily applicable to other ion and neutral atom systems requiring multiple stabilized lasers.

The CIPM list of recommended frequency standard values: guidelines and procedures

NASA Astrophysics Data System (ADS)

Riehle, Fritz; Gill, Patrick; Arias, Felicitas; Robertsson, Lennart

2018-04-01

A list of standard reference frequency values (LoF) of quantum transitions from the microwave to the optical regime has been recommended by the International Committee for Weights and Measures (Comité international des poids et mesures, CIPM) for use in basic research, technology, and for the metrology of time, frequency and length. The CIPM LoF contains entries that are recommended as secondary representations of the second in the International System of Units, and entries that can be used to serve as realizations of the definition of the metre. The historical perspective that led to the CIPM LoF is outlined. Procedures have been developed for updating existing, and validating new, entries into the CIPM LoF. The CIPM LoF might serve as an entry for a future redefinition of the second by an optical transition.

education | News

Science.gov Websites

, agencies and professional associations. Introduction to metrology career day at St. Charles North High St. Charles North High School students to talk with them about metrology. Here, use a portable , a Fermilab metrology technical specialist, visited St. Charles North High School students to talk

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Diaz, Rosemary T.; Macdonald, Daniel R.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission, were used to search for locally anisotropic space-time, with a null result at the 10 to the negative 10th power level.

Photogrammetric Metrology for the James Webb Space Telescope Integrated Science Instrument Module

NASA Technical Reports Server (NTRS)

Nowak, Maria; Crane, Allen; Davila, Pam; Eichhorn, William; Gill, James; Herrera, Acey; Hill, Michael; Hylan, Jason; Jetten, Mark; Marsh, James;

A study of swing-curve physics in diffraction-based overlay

NASA Astrophysics Data System (ADS)

Bhattacharyya, Kaustuve; den Boef, Arie; Storms, Greet; van Heijst, Joost; Noot, Marc; An, Kevin; Park, Noh-Kyoung; Jeon, Se-Ra; Oh, Nang-Lyeom; McNamara, Elliott; van de Mast, Frank; Oh, SeungHwa; Lee, Seung Yoon; Hwang, Chan; Lee, Kuntack

2016-03-01

With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection. In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.

A broadband chip-scale optical frequency synthesizer at 2.7 × 10−16 relative uncertainty

PubMed Central

Huang, Shu-Wei; Yang, Jinghui; Yu, Mingbin; McGuyer, Bart H.; Kwong, Dim-Lee; Zelevinsky, Tanya; Wong, Chee Wei

2016-01-01

Optical frequency combs—coherent light sources that connect optical frequencies with microwave oscillations—have become the enabling tool for precision spectroscopy, optical clockwork, and attosecond physics over the past decades. Current benchmark systems are self-referenced femtosecond mode-locked lasers, but Kerr nonlinear dynamics in high-Q solid-state microresonators has recently demonstrated promising features as alternative platforms. The advance not only fosters studies of chip-scale frequency metrology but also extends the realm of optical frequency combs. We report the full stabilization of chip-scale optical frequency combs. The microcomb’s two degrees of freedom, one of the comb lines and the native 18-GHz comb spacing, are simultaneously phase-locked to known optical and microwave references. Active comb spacing stabilization improves long-term stability by six orders of magnitude, reaching a record instrument-limited residual instability of 3.6mHz/τ. Comparing 46 nitride frequency comb lines with a fiber laser frequency comb, we demonstrate the unprecedented microcomb tooth-to-tooth relative frequency uncertainty down to 50 mHz and 2.7 × 10−16, heralding novel solid-state applications in precision spectroscopy, coherent communications, and astronomical spectrography. PMID:27152341

A Toolbox of Metrology-Based Techniques for Optical System Alignment

NASA Technical Reports Server (NTRS)

Coulter, Phillip; Ohl, Raymond G.; Blake, Peter N.; Bos, Brent J.; Casto, Gordon V.; Eichhorn, William L.; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hagopian, John G.; Hayden, Joseph E.;

A Toolbox of Metrology-Based Techniques for Optical System Alignment

NASA Technical Reports Server (NTRS)

Coulter, Phillip; Ohl, Raymond G.; Blake, Peter N.; Bos, Brent J.; Eichhorn, William L.; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hagopian, John G.; Hayden, Joseph E.; Hetherington, Samuel E.;

A programmable quantum current standard from the Josephson and the quantum Hall effects

DOE Office of Scientific and Technical Information (OSTI.GOV)

Poirier, W., E-mail: wilfrid.poirier@lne.fr; Lafont, F.; Djordjevic, S.

We propose a way to realize a programmable quantum current standard (PQCS) from the Josephson voltage standard and the quantum Hall resistance standard (QHR) exploiting the multiple connection technique provided by the quantum Hall effect (QHE) and the exactness of the cryogenic current comparator. The PQCS could lead to breakthroughs in electrical metrology like the realization of a programmable quantum current source, a quantum ampere-meter, and a simplified closure of the quantum metrological triangle. Moreover, very accurate universality tests of the QHE could be performed by comparing PQCS based on different QHRs.

Context-based virtual metrology

NASA Astrophysics Data System (ADS)

Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitriy; Hartig, Carsten; Shifrin, Michael

2018-03-01

Hybrid and data feed forward methodologies are well established for advanced optical process control solutions in highvolume semiconductor manufacturing. Appropriate information from previous measurements, transferred into advanced optical model(s) at following step(s), provides enhanced accuracy and exactness of the measured topographic (thicknesses, critical dimensions, etc.) and material parameters. In some cases, hybrid or feed-forward data are missed or invalid for dies or for a whole wafer. We focus on approaches of virtual metrology to re-create hybrid or feed-forward data inputs in high-volume manufacturing. We discuss missing data inputs reconstruction which is based on various interpolation and extrapolation schemes and uses information about wafer's process history. Moreover, we demonstrate data reconstruction approach based on machine learning techniques utilizing optical model and measured spectra. And finally, we investigate metrics that allow one to assess error margin of virtual data input.

Issues of Teaching Metrology in Higher Education Institutions of Civil Engineering in Russia

ERIC Educational Resources Information Center

Pukharenko, Yurii Vladimirovich; Norin, Veniamin Aleksandrovich

2017-01-01

The work analyses the training process condition in teaching the discipline "Metrology, Standardization, Certification and Quality Control." It proves that the current educational standard regarding the instruction of the discipline "Metrology, Standardization, Certification and Quality Control" does not meet the needs of the…

Metrology Careers: Jobs for Good Measure

ERIC Educational Resources Information Center

Liming, Drew

2009-01-01

What kind of career rewards precision and accuracy? One in metrology--the science of measurement. By evaluating and calibrating the technology in people's everyday lives, metrologists keep their world running smoothly. Metrology is used in the design and production of almost everything people encounter daily, from the cell phones in their pockets…

Advantages of High Tolerance Measurements in Fusion Environments Applying Photogrammetry

DOE Office of Scientific and Technical Information (OSTI.GOV)

T. Dodson, R. Ellis, C. Priniski, S. Raftopoulos, D. Stevens, M. Viola

2009-02-04

Photogrammetry, a state-of-the-art technique of metrology employing digital photographs as the vehicle for measurement, has been investigated in the fusion environment. Benefits of this high tolerance methodology include relatively easy deployment for multiple point measurements and deformation/distortion studies. Depending on the equipment used, photogrammetric systems can reach tolerances of 25 microns (0.001 in) to 100 microns (0.004 in) on a 3-meter object. During the fabrication and assembly of the National Compact Stellarator Experiment (NCSX) the primary measurement systems deployed were CAD coordinate-based computer metrology equipment and supporting algorithms such as both interferometer-aided (IFM) and absolute distance measurementbased (ADM) laser trackers,more » as well as portable Coordinate Measurement Machine (CMM) arms. Photogrammetry was employed at NCSX as a quick and easy tool to monitor coil distortions incurred during welding operations of the machine assembly process and as a way to reduce assembly downtime for metrology processes.« less

Laser SRS tracker for reverse prototyping tasks

NASA Astrophysics Data System (ADS)

Kolmakov, Egor; Redka, Dmitriy; Grishkanich, Aleksandr; Tsvetkov, Konstantin

2017-10-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

With Great Measurements Come Great Results

NASA Astrophysics Data System (ADS)

Williams, Carl

Measurements are the foundation for science and modern life. Technologies we take for granted every day depend on them-cell phones, CAT scans, pharmaceuticals, even sports equipment. Metrology, or measurement science, determines what industry can make reliably and what they cannot. At the National Institute of Standards and Technology (NIST) we specialize in making world class measurements that an incredibly wide range of industries use to continually improve their products - computer chips with nanoscale components, atomic clocks that you can hold in your hand, lasers for both super-strong welds and delicate eye surgeries. Think of all the key technologies developed over the last 100 years and better measurements, standards, or analysis techniques played a role in making them possible. NIST works collaboratively with industry researchers on the advanced metrology for tomorrow's technologies. A new kilogram based on electromagnetic force, cars that weigh half as much but are just as strong, quantum computers, personalized medicine, single atom devices - it's all happening in our labs now. This talk will focus on how metrology creates the future.

Neutron activation analysis: A primary method of measurement

NASA Astrophysics Data System (ADS)

Greenberg, Robert R.; Bode, Peter; De Nadai Fernandes, Elisabete A.

2011-03-01

Neutron activation analysis (NAA), based on the comparator method, has the potential to fulfill the requirements of a primary ratio method as defined in 1998 by the Comité Consultatif pour la Quantité de Matière — Métrologie en Chimie (CCQM, Consultative Committee on Amount of Substance — Metrology in Chemistry). This thesis is evidenced in this paper in three chapters by: demonstration that the method is fully physically and chemically understood; that a measurement equation can be written down in which the values of all parameters have dimensions in SI units and thus having the potential for metrological traceability to these units; that all contributions to uncertainty of measurement can be quantitatively evaluated, underpinning the metrological traceability; and that the performance of NAA in CCQM key-comparisons of trace elements in complex matrices between 2000 and 2007 is similar to the performance of Isotope Dilution Mass Spectrometry (IDMS), which had been formerly designated by the CCQM as a primary ratio method.

A Study on Performance and Safety Tests of Electrosurgical Equipment.

PubMed

Tavakoli Golpaygani, A; Movahedi, M M; Reza, M

2016-09-01

Modern medicine employs a wide variety of instruments with different physiological effects and measurements. Periodic verifications are routinely used in legal metrology for industrial measuring instruments. The correct operation of electrosurgical generators is essential to ensure patient's safety and management of the risks associated with the use of high and low frequency electrical currents on human body. The metrological reliability of 20 electrosurgical equipment in six hospitals (3 private and 3 public) was evaluated in one of the provinces of Iran according to international and national standards. The achieved results show that HF leakage current of ground-referenced generators are more than isolated generators and the power analysis of only eight units delivered acceptable output values and the precision in the output power measurements was low. Results indicate a need for new and severe regulations on periodic performance verifications and medical equipment quality control program especially in high risk instruments. It is also necessary to provide training courses for operating staff in the field of meterology in medicine to be acquianted with critical parameters to get accuracy results with operation room equipment.

Quantum cascade lasers as metrological tools for space optics

NASA Astrophysics Data System (ADS)

Bartalini, S.; Borri, S.; Galli, I.; Mazzotti, D.; Cancio Pastor, P.; Giusfredi, G.; De Natale, P.

2017-11-01

A distributed-feedback quantum-cascade laser working in the 4.3÷4.4 mm range has been frequency stabilized to the Lamb-dip center of a CO2 ro-vibrational transition by means of first-derivative locking to the saturated absorption signal, and its absolute frequency counted with a kHz-level precision and an overall uncertainty of 75 kHz. This has been made possible by an optical link between the QCL and a near-IR Optical Frequency Comb Synthesizer, thanks to a non-linear sum-frequency generation process with a fiber-amplified Nd:YAG laser. The implementation of a new spectroscopic technique, known as polarization spectroscopy, provides an improved signal for the locking loop, and will lead to a narrower laser emission and a drastic improvement in the frequency stability, that in principle is limited only by the stability of the optical frequency comb synthesizer (few parts in 1013). These results confirm quantum cascade lasers as reliable sources not only for high-sensitivity, but also for highprecision measurements, ranking them as optimal laser sources for space applications.

Final report of key comparison AFRIMETS.AUV.A-K5: primary pressure calibration of LS1P microphones according to IEC 61094-2, over the frequency range 2 Hz to 10 kHz.

NASA Astrophysics Data System (ADS)

Nel, R.; Avison, J.; Harris, P.; Blabla, M.; Hämäläinen, J.

2017-01-01

The degrees of equivalence of the AFRIMETS.AUV.A-K5 regional key comparison are reported here as the final report. The scope of the comparison covered the complex pressure sensitivities of two LS1P microphones over the frequency range 2 Hz to 10 kHz in accordance with IEC 61094-2: 2009. Four national metrology institutes from two different regional metrology organisations participated in the comparison. Two LS1P microphones were circulated simultaneously to all the participants in a circular configuration. One of the microphones sensitivity shifted and all results associated with this microphone were subsequently excluded from further analysis and linking. The AFRIMETS.AUV.A-K5 comparison results were linked to the CCAUV.A-K5 comparison results via dual participation in the CCAUV.A-K5 and AFRIMETS.AUV.A-K5 comparisons. The degrees of equivalence, linked to the CCAUV.A-K5 comparison, were calculated for all participants of this comparison. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Linear and nonlinear frequency- and time-domain spectroscopy with multiple frequency combs.

PubMed

Bennett, Kochise; Rouxel, Jeremy R; Mukamel, Shaul

2017-09-07

Two techniques that employ equally spaced trains of optical pulses to map an optical high frequency into a low frequency modulation of the signal that can be detected in real time are compared. The development of phase-stable optical frequency combs has opened up new avenues to metrology and spectroscopy. The ability to generate a series of frequency spikes with precisely controlled separation permits a fast, highly accurate sampling of the material response. Recently, pairs of frequency combs with slightly different repetition rates have been utilized to down-convert material susceptibilities from the optical to microwave regime where they can be recorded in real time. We show how this one-dimensional dual comb technique can be extended to multiple dimensions by using several combs. We demonstrate how nonlinear susceptibilities can be quickly acquired using this technique. In a second class of techniques, sequences of ultrafast mode locked laser pulses are used to recover pathways of interactions contributing to nonlinear susceptibilities by using a photo-acoustic modulation varying along the sequences. We show that these techniques can be viewed as a time-domain analog of the multiple frequency comb scheme.

Investigation of hyper-NA scanner emulation for photomask CDU performance

NASA Astrophysics Data System (ADS)

Poortinga, Eric; Scheruebl, Thomas; Conley, Will; Sundermann, Frank

2007-02-01

As the semiconductor industry moves toward immersion lithography using numerical apertures above 1.0 the quality of the photomask becomes even more crucial. Photomask specifications are driven by the critical dimension (CD) metrology within the wafer fab. Knowledge of the CD values at resist level provides a reliable mechanism for the prediction of device performance. Ultimately, tolerances of device electrical properties drive the wafer linewidth specifications of the lithography group. Staying within this budget is influenced mainly by the scanner settings, resist process, and photomask quality. Tightening of photomask specifications is one mechanism for meeting the wafer CD targets. The challenge lies in determining how photomask level metrology results influence wafer level imaging performance. Can it be inferred that photomask level CD performance is the direct contributor to wafer level CD performance? With respect to phase shift masks, criteria such as phase and transmission control are generally tightened with each technology node. Are there other photomask relevant influences that effect wafer CD performance? A comprehensive study is presented supporting the use of scanner emulation based photomask CD metrology to predict wafer level within chip CD uniformity (CDU). Using scanner emulation with the photomask can provide more accurate wafer level prediction because it inherently includes all contributors to image formation related to the 3D topography such as the physical CD, phase, transmission, sidewall angle, surface roughness, and other material properties. Emulated images from different photomask types were captured to provide CD values across chip. Emulated scanner image measurements were completed using an AIMS TM45-193i with its hyper-NA, through-pellicle data acquisition capability including the Global CDU Map TM software option for AIMS TM tools. The through-pellicle data acquisition capability is an essential prerequisite for capturing final CDU data (after final clean and pellicle mounting) before the photomask ships or for re-qualification at the wafer fab. Data was also collected on these photomasks using a conventional CD-SEM metrology system with the pellicles removed. A comparison was then made to wafer prints demonstrating the benefit of using scanner emulation based photomask CD metrology.

GPU accelerated Monte-Carlo simulation of SEM images for metrology

NASA Astrophysics Data System (ADS)

Verduin, T.; Lokhorst, S. R.; Hagen, C. W.

2016-03-01

In this work we address the computation times of numerical studies in dimensional metrology. In particular, full Monte-Carlo simulation programs for scanning electron microscopy (SEM) image acquisition are known to be notoriously slow. Our quest in reducing the computation time of SEM image simulation has led us to investigate the use of graphics processing units (GPUs) for metrology. We have succeeded in creating a full Monte-Carlo simulation program for SEM images, which runs entirely on a GPU. The physical scattering models of this GPU simulator are identical to a previous CPU-based simulator, which includes the dielectric function model for inelastic scattering and also refinements for low-voltage SEM applications. As a case study for the performance, we considered the simulated exposure of a complex feature: an isolated silicon line with rough sidewalls located on a at silicon substrate. The surface of the rough feature is decomposed into 408 012 triangles. We have used an exposure dose of 6 mC/cm2, which corresponds to 6 553 600 primary electrons on average (Poisson distributed). We repeat the simulation for various primary electron energies, 300 eV, 500 eV, 800 eV, 1 keV, 3 keV and 5 keV. At first we run the simulation on a GeForce GTX480 from NVIDIA. The very same simulation is duplicated on our CPU-based program, for which we have used an Intel Xeon X5650. Apart from statistics in the simulation, no difference is found between the CPU and GPU simulated results. The GTX480 generates the images (depending on the primary electron energy) 350 to 425 times faster than a single threaded Intel X5650 CPU. Although this is a tremendous speedup, we actually have not reached the maximum throughput because of the limited amount of available memory on the GTX480. Nevertheless, the speedup enables the fast acquisition of simulated SEM images for metrology. We now have the potential to investigate case studies in CD-SEM metrology, which otherwise would take unreasonable amounts of computation time.

A novel multi-dimensional absolute distance measurement system using a basic frequency modulated continuous wave radar and an external cavity laser with trilateration metrology

NASA Astrophysics Data System (ADS)

Xiong, Xingting; Qu, Xinghua; Zhang, Fumin

2018-01-01

We propose and describe a novel multi-dimensional absolute distance measurement system. This system incorporates a basic frequency modulated continuous wave (FMCW) radar and an second external cavity laser (ECL). Through the use of trilateration, the system in our paper can provide 3D resolution inherently range. However, the measured optical path length differences (OPD) is often variable in industrial environments and this will causes Doppler effect, which has greatly impact on the measurement result. With using the second ECL, the system can correct the Doppler effect to ensure the precision of absolute distance measurement. Result of the simulation will prove the influence of Doppler effect.

Range-Gated Metrology: An Ultra-Compact Sensor for Dimensional Stabilization

NASA Technical Reports Server (NTRS)

Lay, Oliver P.; Dubovitsky, Serge; Shaddock, Daniel A.; Ware, Brent; Woodruff, Christopher S.

2008-01-01

Point-to-point laser metrology systems can be used to stabilize large structures at the nanometer levels required for precision optical systems. Existing sensors are large and intrusive, however, with optical heads that consist of several optical elements and require multiple optical fiber connections. The use of point-to-point laser metrology has therefore been limited to applications where only a few gauges are needed and there is sufficient space to accommodate them. Range-Gated Metrology is a signal processing technique that preserves nanometer-level or better performance while enabling: (1) a greatly simplified optical head - a single fiber optic collimator - that can be made very compact, and (2) a single optical fiber connection that is readily multiplexed. This combination of features means that it will be straightforward and cost-effective to embed tens or hundreds of compact metrology gauges to stabilize a large structure. In this paper we describe the concept behind Range-Gated Metrology, demonstrate the performance in a laboratory environment, and give examples of how such a sensor system might be deployed.

Patterning control strategies for minimum edge placement error in logic devices

NASA Astrophysics Data System (ADS)

Mulkens, Jan; Hanna, Michael; Slachter, Bram; Tel, Wim; Kubis, Michael; Maslow, Mark; Spence, Chris; Timoshkov, Vadim

2017-03-01

In this paper we discuss the edge placement error (EPE) for multi-patterning semiconductor manufacturing. In a multi-patterning scheme the creation of the final pattern is the result of a sequence of lithography and etching steps, and consequently the contour of the final pattern contains error sources of the different process steps. We describe the fidelity of the final pattern in terms of EPE, which is defined as the relative displacement of the edges of two features from their intended target position. We discuss our holistic patterning optimization approach to understand and minimize the EPE of the final pattern. As an experimental test vehicle we use the 7-nm logic device patterning process flow as developed by IMEC. This patterning process is based on Self-Aligned-Quadruple-Patterning (SAQP) using ArF lithography, combined with line cut exposures using EUV lithography. The computational metrology method to determine EPE is explained. It will be shown that ArF to EUV overlay, CDU from the individual process steps, and local CD and placement of the individual pattern features, are the important contributors. Based on the error budget, we developed an optimization strategy for each individual step and for the final pattern. Solutions include overlay and CD metrology based on angle resolved scatterometry, scanner actuator control to enable high order overlay corrections and computational lithography optimization to minimize imaging induced pattern placement errors of devices and metrology targets.

Diffraction-based overlay for spacer patterning and double patterning technology

NASA Astrophysics Data System (ADS)

Lee, Byoung Hoon; Park, JeongSu; Lee, Jongsu; Park, Sarohan; Lim, ChangMoon; Yim, Dong-Gyu; Park, Sungki; Ryu, Chan-Ho; Morgan, Stephen; van de Schaar, Maurits; Fuchs, Andreas; Bhattacharyya, Kaustuve

2011-03-01

Overlay performance will be increasingly important for Spacer Patterning Technology (SPT) and Double Patterning Technology (DPT) as various Resolution Enhancement Techniques are employed to extend the resolution limits of lithography. Continuous shrinkage of devices makes overlay accuracy one of the most critical issues while overlay performance is completely dependent on exposure tool. Image Based Overlay (IBO) has been used as the mainstream metrology for overlay by the main memory IC companies, but IBO is not suitable for some critical layers due to the poor Tool Induced Shift (TIS) values. Hence new overlay metrology is required to improve the overlay measurement accuracy. Diffraction Based Overlay (DBO) is regarded to be an alternative metrology to IBO for more accurate measurements and reduction of reading errors. Good overlay performances of DBO have been reported in many articles. However applying DBO for SPT and DPT layers poses extra challenges for target design. New vernier designs are considered for different DPT and SPT schemes to meet overlay target in DBO system. In this paper, we optimize the design of the DBO target and the performance of DBO to meet the overlay specification of sub-3x nm devices which are using SPT and DPT processes. We show that the appropriate vernier design yields excellent overlay performance in residual and TIS. The paper also demonstrated the effects of vernier structure on overlay accuracy from SEM analysis.

DOE Office of Scientific and Technical Information (OSTI.GOV)

C. Priniski, T. Dodson, M. Duco, S. Raftopoulos, R. Ellis, and A. Brooks

In support of the National Compact Stellerator Experiment (NCSX), stellerator assembly activities continued this past year at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The construction program saw the completion of the first two Half Field-Period Assemblies (HPA), each consisting of three modular coils. The full machine includes six such sub-assemblies. A single HPA consists of three of the NCSX modular coils wound and assembled at PPPL. These geometrically-complex threedimensional coils were wound using computer-aided metrology and CAD models to tolerances within +/- 0.5mm. The assembly of these coils required similar accuracymore » on a larger scale with the added complexity of more individual parts and fewer degrees of freedom for correction. Several new potential positioning issues developed for which measurement and control techniques were developed. To accomplish this, CAD coordinate-based computer metrology equipment and software similar to the solutions employed for winding the modular coils was used. Given the size of the assemblies, the primary tools were both interferometeraided and Absolute Distance Measurement (ADM)-only based laser trackers. In addition, portable Coordinate Measurement Machine (CMM) arms and some novel indirect measurement techniques were employed. This paper will detail both the use of CAD coordinate-based metrology technology and the techniques developed and employed for dimensional control of NSCX subassemblies. The results achieved and possible improvements to techniques will be discussed.« less

Data fusion for CD metrology: heterogeneous hybridization of scatterometry, CDSEM, and AFM data

NASA Astrophysics Data System (ADS)

Hazart, J.; Chesneau, N.; Evin, G.; Largent, A.; Derville, A.; Thérèse, R.; Bos, S.; Bouyssou, R.; Dezauzier, C.; Foucher, J.

2014-04-01

The manufacturing of next generation semiconductor devices forces metrology tool providers for an exceptional effort in order to meet the requirements for precision, accuracy and throughput stated in the ITRS. In the past years hybrid metrology (based on data fusion theories) has been investigated as a new methodology for advanced metrology [1][2][3]. This paper provides a new point of view of data fusion for metrology through some experiments and simulations. The techniques are presented concretely in terms of equations to be solved. The first point of view is High Level Fusion which is the use of simple numbers with their associated uncertainty postprocessed by tools. In this paper, it is divided into two stages: one for calibration to reach accuracy, the second to reach precision thanks to Bayesian Fusion. From our perspective, the first stage is mandatory before applying the second stage which is commonly presented [1]. However a reference metrology system is necessary for this fusion. So, precision can be improved if and only if the tools to be fused are perfectly matched at least for some parameters. We provide a methodology similar to a multidimensional TMU able to perform this matching exercise. It is demonstrated on a 28 nm node backend lithography case. The second point of view is Deep Level Fusion which works on the contrary with raw data and their combination. In the approach presented here, the analysis of each raw data is based on a parametric model and connections between the parameters of each tool. In order to allow OCD/SEM Deep Level Fusion, a SEM Compact Model derived from [4] has been developed and compared to AFM. As far as we know, this is the first time such techniques have been coupled at Deep Level. A numerical study on the case of a simple stack for lithography is performed. We show strict equivalence of Deep Level Fusion and High Level Fusion when tools are sensitive and models are perfect. When one of the tools can be considered as a reference and the second is biased, High Level Fusion is far superior to standard Deep Level Fusion. Otherwise, only the second stage of High Level Fusion is possible (Bayesian Fusion) and do not provide substantial advantage. Finally, when OCD is equipped with methods for bias detection [5], Deep Level Fusion outclasses the two-stage High Level Fusion and will benefit to the industry for most advanced nodes production.

Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

NASA Astrophysics Data System (ADS)

Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

2016-06-01

Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial measurement for large structure with similar dimension with large deployable reflector to confirm the validity of the network design and instrumentation. In this report, the overview of this R&D project and the results of feasibility study of network design based on simulations on vision metrology and beam pattern compensation of antenna with very large reflector in orbit is discussed. The feasibility of assumed network design for vision metrology and satisfaction of accuracy requirements are discussed. The feasibility of beam pattern compensation by using accurately measured reflector shape is confirmed with antenna pattern simulation for deformed parabola reflector. If reflector surface of communication satellite can be measured routinely in orbit, the antenna pattern can be compensated and maintain the high performance every moment.

Characterizing opto-electret based paper speakers by using a real-time projection Moiré metrology system

NASA Astrophysics Data System (ADS)

Chang, Ya-Ling; Hsu, Kuan-Yu; Lee, Chih-Kung

2016-03-01

Advancement of distributed piezo-electret sensors and actuators facilitates various smart systems development, which include paper speakers, opto-piezo/electret bio-chips, etc. The array-based loudspeaker system possess several advantages over conventional coil speakers, such as light-weightness, flexibility, low power consumption, directivity, etc. With the understanding that the performance of the large-area piezo-electret loudspeakers or even the microfluidic biochip transport behavior could be tailored by changing their dynamic behaviors, a full-field real-time high-resolution non-contact metrology system was developed. In this paper, influence of the resonance modes and the transient vibrations of an arraybased loudspeaker system on the acoustic effect were measured by using a real-time projection moiré metrology system and microphones. To make the paper speaker even more versatile, we combine the photosensitive material TiOPc into the original electret loudspeaker. The vibration of this newly developed opto-electret loudspeaker could be manipulated by illuminating different light-intensity patterns. Trying to facilitate the tailoring process of the opto-electret loudspeaker, projection moiré was adopted to measure its vibration. By recording the projected fringes which are modulated by the contours of the testing sample, the phase unwrapping algorithm can give us a continuous phase distribution which is proportional to the object height variations. With the aid of the projection moiré metrology system, the vibrations associated with each distinctive light pattern could be characterized. Therefore, we expect that the overall acoustic performance could be improved by finding the suitable illuminating patterns. In this manuscript, the system performance of the projection moiré and the optoelectret paper speakers were cross-examined and verified by the experimental results obtained.

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

NASA Astrophysics Data System (ADS)

Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brueck, Hans-Juergen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Volodymyr; Jonckheere, Rik M.; Philipsen, Vicky; Schaetz, Thomas; Sommer, Karl

2002-08-01

Critical Dimension fidelity continues to be one of the key driving parameters defining photomask quality and printing performance. The present advanced optical CD metrology systems, operating at i-line, will very soon be challenged as viable tools owing to their restricted resolution and measurement linearity impact on the ability to produce repeatable measurements. Alternative measurement technologies such as CD-SEM and -AFM have started to appear, but are also not without tier concerns in the field of reticle CD metrology. This paper introduces a new optical metrology system (MueTec /) operating at DUV wavelength (248nm), which has been specifically designed to meet the resolution and measurement repeatability requirements of reticle manufacture at the 130nm and 100nm nodes. The system is based upon a specially designed mechanical-optical platform for maximum stability and very advanced optical, illumination, alignment and software systems. The at wavelength operation of this system also makes it an ideal platform for defect printability analysis and review. The system is currently part of a European Commission funded assessment project (IST-2000-28086: McD'OR) to develop a testing strategy to verify the system performance, agree on equipment specifications and demonstrate its capability on advanced production reticles - including long-term reliability. It is the preliminary results from this evaluation that are presented here.

Coordinate metrology using scanning probe microscopes

NASA Astrophysics Data System (ADS)

Marinello, F.; Savio, E.; Bariani, P.; Carmignato, S.

2009-08-01

New positioning, probing and measuring strategies in coordinate metrology are needed for the accomplishment of true three-dimensional characterization of microstructures, with uncertainties in the nanometre range. In the present work, the implementation of scanning probe microscopes (SPMs) as systems for coordinate metrology is discussed. A new non-raster measurement approach is proposed, where the probe is moved to sense points along free paths on the sample surface, with no loss of accuracy with respect to traditional raster scanning and scan time reduction. Furthermore, new probes featuring long tips with innovative geometries suitable for coordinate metrology through SPMs are examined and reported.

Surface Wave Metrology for Copper/Low-k Interconnects

NASA Astrophysics Data System (ADS)

Gostein, M.; Maznev, A. A.; Mazurenko, A.; Tower, J.

2005-09-01

We review recent advances in the application of laser-induced surface acoustic wave metrology to issues in copper/low-k interconnect development and manufacturing. We illustrate how the metrology technique can be used to measure copper thickness uniformity on a range of features from solid pads to arrays of lines, focusing on specific processing issues in copper electrochemical deposition (ECD) and chemical-mechanical polishing (CMP). In addition, we review recent developments in surface wave metrology for the characterization of low-k dielectric elastic modulus, including the ability to measure within-wafer uniformity of elastic modulus and to characterize porous, anisotropic films.

EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The aimed uncertainty is < 1 % for static mixtures at the 10 to 100 μmol/mol level, and < 3 % for portable dynamic generators in the 0 to 500 nmol/mol amount fraction range. Special emphasis is put on the minimisation of adsorption losses. To develop and characterise laser based optical spectrometric standards Evaluation and characterisation of the applicability of a newly developed open-path as well as of existing extractive measurement techniques as optical transfer standards according to metrological standards. To establish the transfer from high-accuracy standards to field applicable methods Employment of characterised exposure chambers as well as field sites for validation and comparison experiments to test and evaluate the performance of different instruments and measurement methods at ammonia amount fractions of the ambient air. The active exchange in workshops and inter-comparisons, publications in technical journals as well as presentations at relevant conferences and standardisation bodies will transfer the knowledge to stakeholders and end-users. The work has been carried out in the framework of the EMRP. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Advanced Mathematical Tools in Metrology III

NASA Astrophysics Data System (ADS)

Ciarlini, P.

The Table of Contents for the book is as follows: * Foreword * Invited Papers * The ISO Guide to the Expression of Uncertainty in Measurement: A Bridge between Statistics and Metrology * Bootstrap Algorithms and Applications * The TTRSs: 13 Oriented Constraints for Dimensioning, Tolerancing & Inspection * Graded Reference Data Sets and Performance Profiles for Testing Software Used in Metrology * Uncertainty in Chemical Measurement * Mathematical Methods for Data Analysis in Medical Applications * High-Dimensional Empirical Linear Prediction * Wavelet Methods in Signal Processing * Software Problems in Calibration Services: A Case Study * Robust Alternatives to Least Squares * Gaining Information from Biomagnetic Measurements * Full Papers * Increase of Information in the Course of Measurement * A Framework for Model Validation and Software Testing in Regression * Certification of Algorithms for Determination of Signal Extreme Values during Measurement * A Method for Evaluating Trends in Ozone-Concentration Data and Its Application to Data from the UK Rural Ozone Monitoring Network * Identification of Signal Components by Stochastic Modelling in Measurements of Evoked Magnetic Fields from Peripheral Nerves * High Precision 3D-Calibration of Cylindrical Standards * Magnetic Dipole Estimations for MCG-Data * Transfer Functions of Discrete Spline Filters * An Approximation Method for the Linearization of Tridimensional Metrology Problems * Regularization Algorithms for Image Reconstruction from Projections * Quality of Experimental Data in Hydrodynamic Research * Stochastic Drift Models for the Determination of Calibration Intervals * Short Communications * Projection Method for Lidar Measurement * Photon Flux Measurements by Regularised Solution of Integral Equations * Correct Solutions of Fit Problems in Different Experimental Situations * An Algorithm for the Nonlinear TLS Problem in Polynomial Fitting * Designing Axially Symmetric Electromechanical Systems of Superconducting Magnetic Levitation in Matlab Environment * Data Flow Evaluation in Metrology * A Generalized Data Model for Integrating Clinical Data and Biosignal Records of Patients * Assessment of Three-Dimensional Structures in Clinical Dentistry * Maximum Entropy and Bayesian Approaches to Parameter Estimation in Mass Metrology * Amplitude and Phase Determination of Sinusoidal Vibration in the Nanometer Range using Quadrature Signals * A Class of Symmetric Compactly Supported Wavelets and Associated Dual Bases * Analysis of Surface Topography by Maximum Entropy Power Spectrum Estimation * Influence of Different Kinds of Errors on Imaging Results in Optical Tomography * Application of the Laser Interferometry for Automatic Calibration of Height Setting Micrometer * Author Index

High efficiency quantum cascade laser frequency comb.

PubMed

Lu, Quanyong; Wu, Donghai; Slivken, Steven; Razeghi, Manijeh

2017-03-06

An efficient mid-infrared frequency comb source is of great interest to high speed, high resolution spectroscopy and metrology. Here we demonstrate a mid-IR quantum cascade laser frequency comb with a high power output and narrow beatnote linewidth at room temperature. The active region was designed with a strong-coupling between the injector and the upper lasing level for high internal quantum efficiency and a broadband gain. The group velocity dispersion was engineered for efficient, broadband mode-locking via four wave mixing. The comb device exhibits a narrow intermode beatnote linewidth of 50.5 Hz and a maximum wall-plug efficiency of 6.5% covering a spectral coverage of 110 cm -1 at λ ~ 8 μm. The efficiency is improved by a factor of 6 compared with previous demonstrations. The high power efficiency and narrow beatnote linewidth will greatly expand the applications of quantum cascade laser frequency combs including high-precision remote sensing and spectroscopy.

High efficiency quantum cascade laser frequency comb

PubMed Central

Lu, Quanyong; Wu, Donghai; Slivken, Steven; Razeghi, Manijeh

2017-01-01

An efficient mid-infrared frequency comb source is of great interest to high speed, high resolution spectroscopy and metrology. Here we demonstrate a mid-IR quantum cascade laser frequency comb with a high power output and narrow beatnote linewidth at room temperature. The active region was designed with a strong-coupling between the injector and the upper lasing level for high internal quantum efficiency and a broadband gain. The group velocity dispersion was engineered for efficient, broadband mode-locking via four wave mixing. The comb device exhibits a narrow intermode beatnote linewidth of 50.5 Hz and a maximum wall-plug efficiency of 6.5% covering a spectral coverage of 110 cm−1 at λ ~ 8 μm. The efficiency is improved by a factor of 6 compared with previous demonstrations. The high power efficiency and narrow beatnote linewidth will greatly expand the applications of quantum cascade laser frequency combs including high-precision remote sensing and spectroscopy. PMID:28262834

Vibration-tolerant narrow-linewidth semiconductor disk laser using novel frequency-stabilisation schemes

NASA Astrophysics Data System (ADS)

Hunter, Craig R.; Jones, Brynmor E.; Schlosser, Peter; Sørensen, Simon Toft; Strain, Michael J.; McKnight, Loyd J.

2018-02-01

This paper will present developments in narrow-linewidth semiconductor-disk-laser systems using novel frequencystabilisation schemes for reduced sensitivity to mechanical vibrations, a critical requirement for mobile applications. Narrow-linewidth single-frequency lasers are required for a range of applications including metrology and highresolution spectroscopy. Stabilisation of the laser was achieved using a monolithic fibre-optic ring resonator with free spectral range of 181 MHz and finesse of 52 to act as passive reference cavity for the laser. Such a cavity can operate over a broad wavelength range and is immune to a wide band of vibrational frequency noise due to its monolithic implementation. The frequency noise of the locked system has been measured and compared to typical Fabry-Perotlocked lasers using vibration equipment to simulate harsh environments, and analysed here. Locked linewidths of < 40 kHz have been achieved. These developments offer a portable, narrow-linewidth laser system for harsh environments that can be flexibly designed for a range of applications.

Roles of chemical metrology in electronics industry and associated environment in Korea: a tutorial.

PubMed

Kang, Namgoo; Joong Kim, Kyung; Seog Kim, Jin; Hae Lee, Joung

2015-03-01

Chemical metrology is gaining importance in electronics industry that manufactures semiconductors, electronic displays, and microelectronics. Extensive and growing needs from this industry have raised the significance of accurate measurements of the amount of substances and material properties. For the first time, this paper presents information on how chemical metrology is being applied to meet a variety of needs in the aspects of quality control of electronics products and environmental regulations closely associated with electronics industry. For a better understanding of the roles of the chemical metrology within electronics industry, the recent research activities and results in chemical metrology are presented using typical examples in Korea where electronic industry is leading a national economy. Particular attention is paid to the applications of chemical metrology for advancing emerging electronics technology developments. Such examples are a novel technique for the accurate quantification of gas composition at nano-liter levels within a MEMS package, the surface chemical analysis of a semiconductor device. Typical metrological tools are also presented for the development of certified reference materials for fluorinated greenhouse gases and proficiency testing schemes for heavy metals and chlorinated toxic gas in order to cope properly with environmental issues within electronics industry. In addition, a recent technique is presented for the accurate measurement of the destruction and removal efficiency of a typical greenhouse gas scrubber. Copyright © 2014 Elsevier B.V. All rights reserved.

Driving imaging and overlay performance to the limits with advanced lithography optimization

NASA Astrophysics Data System (ADS)

Mulkens, Jan; Finders, Jo; van der Laan, Hans; Hinnen, Paul; Kubis, Michael; Beems, Marcel

2012-03-01

Immersion lithography is being extended to 22-nm and even below. Next to generic scanner system improvements, application specific solutions are needed to follow the requirements for CD control and overlay. Starting from the performance budgets, this paper discusses how to improve (in volume manufacturing environment) CDU towards 1-nm and overlay towards 3-nm. The improvements are based on deploying the actuator capabilities of the immersion scanner. The latest generation immersion scanners have extended the correction capabilities for overlay and imaging, offering freeform adjustments of lens, illuminator and wafer grid. In order to determine the needed adjustments the recipe generation per user application is based on a combination wafer metrology data and computational lithography methods. For overlay, focus and CD metrology we use an angle resolved optical scatterometer.

Optical Fiber-Based MR-Compatible Sensors for Medical Applications: An Overview

PubMed Central

Taffoni, Fabrizio; Formica, Domenico; Saccomandi, Paola; Di Pino, Giovanni; Schena, Emiliano

2013-01-01

During last decades, Magnetic Resonance (MR)—compatible sensors based on different techniques have been developed due to growing demand for application in medicine. There are several technological solutions to design MR-compatible sensors, among them, the one based on optical fibers presents several attractive features. The high elasticity and small size allow designing miniaturized fiber optic sensors (FOS) with metrological characteristics (e.g., accuracy, sensitivity, zero drift, and frequency response) adequate for most common medical applications; the immunity from electromagnetic interference and the absence of electrical connection to the patient make FOS suitable to be used in high electromagnetic field and intrinsically safer than conventional technologies. These two features further heightened the potential role of FOS in medicine making them especially attractive for application in MRI. This paper provides an overview of MR-compatible FOS, focusing on the sensors employed for measuring physical parameters in medicine (i.e., temperature, force, torque, strain, and position). The working principles of the most promising FOS are reviewed in terms of their relevant advantages and disadvantages, together with their applications in medicine. PMID:24145918

The LISA Pathfinder Mission: Sub-picometer Interferometry in Space

NASA Astrophysics Data System (ADS)

Slutsky, Jacob; LISA Pathfinder Collaboration

2018-01-01

The European Space Agency’s LISA Pathfinder was a mission built to demonstrate the technologies essential to implement a space-based gravitational wave observatory sensitive in the milli-Hertz frequency band. ESA recently selected the LISA mission as such a future observatory, scheduled to launch in the early 2030s. LISA Pathfinder launched in late 2015 and concluded its final extended mission in July 2017, during which time it placed the two test masses into free fall and successfully measured the relative acceleration between them to a sensitivity that validates a number of critical technologies for LISA. These include drag-free control of the test masses, low noise microNewton thrusters to control the spacecraft, and sub-picometer-level laser metrology in space. The mission also served as a sensitive probe of the environmenal conditions in which LISA will operate. This poster summarizes the recent analysis results, with an eye towards the implications for the LISA mission.

Dual comb generation from a mode-locked fiber laser with orthogonally polarized interlaced pulses.

PubMed

Akosman, Ahmet E; Sander, Michelle Y

2017-08-07

Ultra-high precision dual-comb spectroscopy traditionally requires two mode-locked, fully stabilized lasers with complex feedback electronics. We present a novel mode-locked operation regime in a thulium-holmium co-doped fiber laser, a frequency-halved state with orthogonally polarized interlaced pulses, for dual comb generation from a single source. In a linear fiber laser cavity, an ultrafast pulse train composed of co-generated, equal intensity and orthogonally polarized consecutive pulses at half of the fundamental repetition rate is demonstrated based on vector solitons. Upon optical interference of the orthogonally polarized pulse trains, two stable microwave RF beat combs are formed, effectively down-converting the optical properties into the microwave regime. These co-generated, dual polarization interlaced pulse trains, from one all-fiber laser configuration with common mode suppression, thus provide an attractive compact source for dual-comb spectroscopy, optical metrology and polarization entanglement measurements.

Traceable terahertz power measurement from 1 THz to 5 THz.

PubMed

Steiger, Andreas; Kehrt, Mathias; Monte, Christian; Müller, Ralf

2013-06-17

The metrology institute in Germany, the Physikalisch-Technische Bundesanstalt (PTB), calibrates the spectral responsivity of THz detectors at 2.52 THz traceable to International System of Units. The Terahertz detector calibration facility is equipped with a standard detector calibrated against a cryogenic radiometer at this frequency. In order to extend this service to a broader spectral range in the THz region a new standard detector was developed. This detector is based on a commercial thermopile detector. Its absorber was modified and characterized by spectroscopic methods with respect to its absorptance and reflectance from 1 THz to 5 THz and at the wavelength of a helium-neon laser in the visible spectral range. This offers the possibility of tracing back the THz power responsivity scale to the more accurate responsivity scale in the visible spectral range and thereby to reduce the uncertainty of detector calibrations in the THz range significantly.

Novel solid state lasers for Lidar applications at 2 μm

NASA Astrophysics Data System (ADS)

Della Valle, G.; Galzerano, G.; Toncelli, A.; Tonelli, M.; Laporta, P.

2005-09-01

A review on the results achieved by our group in the development of novel solid-state lasers for Lidar applications at 2 μm is presented. These lasers, based on fluoride crystals (YLF4, BaY2F8, and KYF4) doped with Tm and Ho ions, are characterized by high-efficiency and wide wavelength tunability around 2 μm. Single crystals of LiYF4, BaY2F8, and KYF4 codoped with the same Tm3+ and Ho3+ concentrations were successfully grown by the Czochralski method. The full spectroscopic characterization of the different laser crystals and the comparison between the laser performance are presented. Continuous wave operation was efficiently demonstrated by means of a CW diode-pumping. These oscillators find interesting applications in the field of remote sensing (Lidar and Dial systems) as well as in high-resolution molecular spectroscopy, frequency metrology, and biomedical applications.

Ultralow-threshold cascaded Brillouin microlaser for tunable microwave generation.

PubMed

Guo, Changlei; Che, Kaijun; Cai, Zhiping; Liu, Shuai; Gu, Guoqiang; Chu, Chengxu; Zhang, Pan; Fu, Hongyan; Luo, Zhengqian; Xu, Huiying

2015-11-01

We experimentally demonstrate an ultralow-threshold cascaded Brillouin microlaser for tunable microwave generation in a high-Q silica microsphere resonator. The threshold of the Brillouin microlaser is as low as 8 μW, which is close to the theoretical prediction. Moreover, the fifth-order Stokes line with a frequency shift up to 55 GHz is achieved with a coupled pump power of less than 0.6 mW. Benefiting from resonant wavelength shifts driven by thermal dynamics in the microsphere, we further realized tunable microwave signals with tuning ranges of 40 MHz at an 11 GHz band and 20 MHz at a 22 GHz band. To the best of our knowledge, it was the first attempt for tunable microwave source based on the whispering-gallery-mode Brillouin microlaser. Such a tunable microwave source from a cascaded Brillouin microlaser could find significant applications in aerospace, communication engineering, and metrology.

Deceleration, precooling, and multi-pass stopping of highly charged ions in Be{sup +} Coulomb crystals

DOE Office of Scientific and Technical Information (OSTI.GOV)

Schmöger, L., E-mail: lisa.schmoeger@mpi-hd.mpg.de; Schwarz, M.; Versolato, O. O.

2015-10-15

Preparing highly charged ions (HCIs) in a cold and strongly localized state is of particular interest for frequency metrology and tests of possible spatial and temporal variations of the fine structure constant. Our versatile preparation technique is based on the generic modular combination of a pulsed ion source with a cryogenic linear Paul trap. Both instruments are connected by a compact beamline with deceleration and precooling properties. We present its design and commissioning experiments regarding these two functionalities. A pulsed buncher tube allows for the deceleration and longitudinal phase-space compression of the ion pulses. External injection of slow HCIs, specificallymore » Ar{sup 13+}, into the linear Paul trap and their subsequent retrapping in the absence of sympathetic cooling is demonstrated. The latter proved to be a necessary prerequisite for the multi-pass stopping of HCIs in continuously laser-cooled Be{sup +} Coulomb crystals.« less

Metrology for Information Technology

DTIC Science & Technology

1997-05-01

Technology (IT) MEL/ITL Task Group on Metrology for Information Technology (IT) U.S. DEPARTMENT OF COMMERCE Technology Administration National Institute of...NIST management requested a white paper on metrology for information technology (IT). A task group was formed to develop this white paper with...representatives from the Manufacturing Engineering Laboratory (MEL), the Information Technology Laboratory (ITL), and Technology Services (TS). The task

Conceptual Model of Quantities, Units, Dimensions, and Values

NASA Technical Reports Server (NTRS)

Rouquette, Nicolas F.; DeKoenig, Hans-Peter; Burkhart, Roger; Espinoza, Huascar

2011-01-01

JPL collaborated with experts from industry and other organizations to develop a conceptual model of quantities, units, dimensions, and values based on the current work of the ISO 80000 committee revising the International System of Units & Quantities based on the International Vocabulary of Metrology (VIM). By providing support for ISO 80000 in SysML via the International Vocabulary of Metrology (VIM), this conceptual model provides, for the first time, a standard-based approach for addressing issues of unit coherence and dimensional analysis into the practice of systems engineering with SysML-based tools. This conceptual model provides support for two kinds of analyses specified in the International Vocabulary of Metrology (VIM): coherence of units as well as of systems of units, and dimension analysis of systems of quantities. To provide a solid and stable foundation, the model for defining quantities, units, dimensions, and values in SysML is explicitly based on the concepts defined in VIM. At the same time, the model library is designed in such a way that extensions to the ISQ (International System of Quantities) and SI Units (Systeme International d Unites) can be represented, as well as any alternative systems of quantities and units. The model library can be used to support SysML user models in various ways. A simple approach is to define and document libraries of reusable systems of units and quantities for reuse across multiple projects, and to link units and quantity kinds from these libraries to Unit and QuantityKind stereotypes defined in SysML user models.

On the benefit of high resolution and low aberrations for in-die mask registration metrology

NASA Astrophysics Data System (ADS)

Beyer, Dirk; Seidel, Dirk; Heisig, Sven; Steinert, Steffen; Töpfer, Susanne; Scherübl, Thomas; Hetzler, Jochen

2014-10-01

With the introduction of complex lithography schemes like double and multi - patterning and new design principles like gridded designs with cut masks the requirements for mask to mask overlay have increased dramatically. Still, there are some good news too for the mask industry since more mask are needed and qualified. Although always confronted with throughput demands, latest writing tool developments are able to keep pace with ever increasing pattern placement specs not only for global signatures but for in-die features within the active area. Placement specs less than 3nm (max. 3 Sigma) are expected and needed in all cases in order to keep the mask contribution to the overall overlay budget at an accepted level. The qualification of these masks relies on high precision metrology tools which have to fulfill stringent metrology as well as resolution constrains at the same time. Furthermore, multi-patterning and gridded designs with pinhole type cut masks are drivers for a paradigm shift in registration metrology from classical registration crosses to in-die registration metrology on production features. These requirements result in several challenges for registration metrology tools. The resolution of the system must be sufficiently high to resolve small production features. At the same time tighter repeatability is required. Furthermore, tool induced shift (TIS) limit the accuracy of in-die measurements. This paper discusses and demonstrates the importance of low illumination wavelength together with low aberrations for best contrast imaging for in-die registration metrology. Typical effects like tool induced shift are analyzed and evaluated using the ZEISS PROVE® registration metrology tool. Additionally, we will address performance gains when going to higher resolution. The direct impact on repeatability for small features by registration measurements will be discussed as well.

Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

NASA Astrophysics Data System (ADS)

Dervilllé, A.; Labrosse, A.; Zimmermann, Y.; Foucher, J.; Gronheid, R.; Boeckx, C.; Singh, A.; Leray, P.; Halder, S.

2016-03-01

The dimensional scaling in IC manufacturing strongly drives the demands on CD and defect metrology techniques and their measurement uncertainties. Defect review has become as important as CD metrology and both of them create a new metrology paradigm because it creates a completely new need for flexible, robust and scalable metrology software. Current, software architectures and metrology algorithms are performant but it must be pushed to another higher level in order to follow roadmap speed and requirements. For example: manage defect and CD in one step algorithm, customize algorithms and outputs features for each R&D team environment, provide software update every day or every week for R&D teams in order to explore easily various development strategies. The final goal is to avoid spending hours and days to manually tune algorithm to analyze metrology data and to allow R&D teams to stay focus on their expertise. The benefits are drastic costs reduction, more efficient R&D team and better process quality. In this paper, we propose a new generation of software platform and development infrastructure which can integrate specific metrology business modules. For example, we will show the integration of a chemistry module dedicated to electronics materials like Direct Self Assembly features. We will show a new generation of image analysis algorithms which are able to manage at the same time defect rates, images classifications, CD and roughness measurements with high throughput performances in order to be compatible with HVM. In a second part, we will assess the reliability, the customization of algorithm and the software platform capabilities to follow new specific semiconductor metrology software requirements: flexibility, robustness, high throughput and scalability. Finally, we will demonstrate how such environment has allowed a drastic reduction of data analysis cycle time.

The need for LWR metrology standardization: the imec roughness protocol

NASA Astrophysics Data System (ADS)

Lorusso, Gian Francesco; Sutani, Takumichi; Rutigliani, Vito; van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunsuke

2018-03-01

As semiconductor technology keeps moving forward, undeterred by the many challenges ahead, one specific deliverable is capturing the attention of many experts in the field: Line Width Roughness (LWR) specifications are expected to be less than 2nm in the near term, and to drop below 1nm in just a few years. This is a daunting challenge and engineers throughout the industry are trying to meet these targets using every means at their disposal. However, although current efforts are surely admirable, we believe they are not enough. The fact is that a specification has a meaning only if there is an agreed methodology to verify if the criterion is met or not. Such a standardization is critical in any field of science and technology and the question that we need to ask ourselves today is whether we have a standardized LWR metrology or not. In other words, if a single reference sample were provided, would everyone measuring it get reasonably comparable results? We came to realize that this is not the case and that the observed spread in the results throughout the industry is quite large. In our opinion, this makes the comparison of LWR data among institutions, or to a specification, very difficult. In this paper, we report the spread of measured LWR data across the semiconductor industry. We investigate the impact of image acquisition, measurement algorithm, and frequency analysis parameters on LWR metrology. We review critically some of the International Technology Roadmap for Semiconductors (ITRS) metrology guidelines (such as measurement box length larger than 2μm and the need to correct for SEM noise). We compare the SEM roughness results to AFM measurements. Finally, we propose a standardized LWR measurement protocol - the imec Roughness Protocol (iRP) - intended to ensure that every time LWR measurements are compared (from various sources or to specifications), the comparison is sensible and sound. We deeply believe that the industry is at a point where it is imperative to guarantee that when talking about a critical parameter such like LWR, everyone speaks the same language, which is not currently the case.

Final Report on the Key Comparison CCM.P-K4.2012 in Absolute Pressure from 1 Pa to 10 kPa

PubMed Central

Ricker, Jacob; Hendricks, Jay; Bock, Thomas; Dominik, Pražák; Kobata, Tokihiko; Torres, Jorge; Sadkovskaya, Irina

2017-01-01

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Institute of Japan (NMIJ), Centro Nacional de Metrología (CENAM), and DI Mendeleyev Institute for Metrology (VNIIM). The comparison was made via a calibrated transfer standard measured at each of the NMIs facilities using their laboratory standard during the period May 2012 to September 2013. The transfer package constructed for this comparison preformed as designed and provided a stable artifact to compare laboratory standards. Overall the participants were found to be statistically equivalent to the key comparison reference value. PMID:28216793

High pressure metrology for industrial applications

NASA Astrophysics Data System (ADS)

Sabuga, Wladimir; Rabault, Thierry; Wüthrich, Christian; Pražák, Dominik; Chytil, Miroslav; Brouwer, Ludwig; Ahmed, Ahmed D. S.

2017-12-01

To meet the needs of industries using high pressure technologies, in traceable, reliable and accurate pressure measurements, a joint research project of the five national metrology institutes and the university was carried out within the European Metrology Research Programme. In particular, finite element methods were established for stress-strain analysis of elastic and nonlinear elastic-plastic deformation, as well as of contact processes in pressure-measuring piston-cylinder assemblies, and high-pressure components at pressures above 1 GPa. New pressure measuring multipliers were developed and characterised, which allow realisation of the pressure scale up to 1.6 GPa. This characterisation is based on research including measurements of material elastic constants by the resonant ultrasound spectroscopy, hardness of materials of high pressure components, density and viscosity of pressure transmitting liquids at pressures up to 1.4 GPa and dimensional measurements on piston-cylinders. A 1.6 GPa pressure system was created for operation of the 1.6 GPa multipliers and calibration of high pressure transducers. A transfer standard for 1.5 GPa pressure range, based on pressure transducers, was built and tested. Herewith, the project developed the capability of measuring pressures up to 1.6 GPa, from which industrial users can calibrate their pressure measurement devices for accurate measurements up to 1.5 GPa.

A universal quantum module for quantum communication, computation, and metrology

NASA Astrophysics Data System (ADS)

Hanks, Michael; Lo Piparo, Nicolò; Trupke, Michael; Schmiedmayer, Jorg; Munro, William J.; Nemoto, Kae

2017-08-01

In this work, we describe a simple module that could be ubiquitous for quantum information based applications. The basic modules comprises a single NV- center in diamond embedded in an optical cavity, where the cavity mediates interactions between photons and the electron spin (enabling entanglement distribution and efficient readout), while the nuclear spins constitutes a long-lived quantum memories capable of storing and processing quantum information. We discuss how a network of connected modules can be used for distributed metrology, communication and computation applications. Finally, we investigate the possible use of alternative diamond centers (SiV/GeV) within the module and illustrate potential advantages.

Fundamental limits of measurement in telecommunications: Experimental and modeling studies in a test optical network on proposal for the reform of telecommunication quantitations

NASA Astrophysics Data System (ADS)

Egan, James; McMillan, Normal; Denieffe, David

2011-08-01

Proposals for a review of the limits of measurement for telecommunications are made. The measures are based on adapting work from the area of chemical metrology for the field of telecommunications. Currie has introduced recommendations for defining the limits of measurement in chemical metrology and has identified three key fundamental limits of measurement. These are the critical level, the detection limit and the determination limit. Measurements on an optical system are used to illustrate the utility of these measures and discussion is given into the advantages of using these fundamental quantitations over existing methods.

Silicon photonic integrated circuit for fast and precise dual-comb distance metrology.

PubMed

Weimann, C; Lauermann, M; Hoeller, F; Freude, W; Koos, C

2017-11-27

We demonstrate an optical distance sensor integrated on a silicon photonic chip with a footprint of well below 1 mm 2 . The integrated system comprises a heterodyne receiver structure with tunable power splitting ratio and on-chip photodetectors. The functionality of the device is demonstrated in a synthetic-wavelength interferometry experiment using frequency combs as optical sources. We obtain accurate and fast distance measurements with an unambiguity range of 3.75 mm, a root-mean-square error of 3.4 µm and acquisition times of 14 µs.

Accelerator infrastructure in Europe: EuCARD 2011

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.

2011-10-01

The paper presents a digest of the research results in the domain of accelerator science and technology in Europe, shown during the annual meeting of the EuCARD - European Coordination of Accelerator Research and Development. The conference concerns building of the research infrastructure, including in this advanced photonic and electronic systems for servicing large high energy physics experiments. There are debated a few basic groups of such systems like: measurement - control networks of large geometrical extent, multichannel systems for large amounts of metrological data acquisition, precision photonic networks of reference time, frequency and phase distribution.

An electrostatic glass actuator for ultrahigh vacuum: A rotating light trap for continuous beams of laser-cooled atoms.

PubMed

Füzesi, F; Jornod, A; Thomann, P; Plimmer, M D; Dudle, G; Moser, R; Sache, L; Bleuler, H

2007-10-01

This article describes the design, characterization, and performance of an electrostatic glass actuator adapted to an ultrahigh vacuum environment (10(-8) mbar). The three-phase rotary motor is used to drive a turbine that acts as a velocity-selective light trap for a slow continuous beam of laser-cooled atoms. This simple, compact, and nonmagnetic device should find applications in the realm of time and frequency metrology, as well as in other areas of atomic, molecular physics and elsewhere.

Absolute Distance Measurement with the MSTAR Sensor

NASA Technical Reports Server (NTRS)

Lay, Oliver P.; Dubovitsky, Serge; Peters, Robert; Burger, Johan; Ahn, Seh-Won; Steier, William H.; Fetterman, Harrold R.; Chang, Yian

2003-01-01

The MSTAR sensor (Modulation Sideband Technology for Absolute Ranging) is a new system for measuring absolute distance, capable of resolving the integer cycle ambiguity of standard interferometers, and making it possible to measure distance with sub-nanometer accuracy. The sensor uses a single laser in conjunction with fast phase modulators and low frequency detectors. We describe the design of the system - the principle of operation, the metrology source, beamlaunching optics, and signal processing - and show results for target distances up to 1 meter. We then demonstrate how the system can be scaled to kilometer-scale distances.

Manufacturing Laboratory for Next Generation Engineers

DTIC Science & Technology

2013-12-16

automated CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine...CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine, plasma...System Metrology and Quality Control Equipment - This area already had a CMM and other well known quality control instrumentation. It has been enhanced

Emerging technology for astronomical optics metrology

NASA Astrophysics Data System (ADS)

Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

2018-05-01

Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

A metrological approach to improve accuracy and reliability of ammonia measurements in ambient air

NASA Astrophysics Data System (ADS)

Pogány, Andrea; Balslev-Harder, David; Braban, Christine F.; Cassidy, Nathan; Ebert, Volker; Ferracci, Valerio; Hieta, Tuomas; Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Peltola, Jari; Persijn, Stefan; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-11-01

The environmental impacts of ammonia (NH3) in ambient air have become more evident in the recent decades, leading to intensifying research in this field. A number of novel analytical techniques and monitoring instruments have been developed, and the quality and availability of reference gas mixtures used for the calibration of measuring instruments has also increased significantly. However, recent inter-comparison measurements show significant discrepancies, indicating that the majority of the newly developed devices and reference materials require further thorough validation. There is a clear need for more intensive metrological research focusing on quality assurance, intercomparability and validations. MetNH3 (Metrology for ammonia in ambient air) is a three-year project within the framework of the European Metrology Research Programme (EMRP), which aims to bring metrological traceability to ambient ammonia measurements in the 0.5-500 nmol mol-1 amount fraction range. This is addressed by working in three areas: (1) improving accuracy and stability of static and dynamic reference gas mixtures, (2) developing an optical transfer standard and (3) establishing the link between high-accuracy metrological standards and field measurements. In this article we describe the concept, aims and first results of the project.

PREFACE: 3rd International Congress on Mechanical Metrology (CIMMEC2014)

NASA Astrophysics Data System (ADS)

2015-10-01

From October 14th to 16th 2014, The Brazilian National Institute of Metrology, Quality, and Technology (Inmetro) and the Brazilian Society of Metrology (SBM) organized the 3rd International Congress on Mechanical Metrology (3rd CIMMEC). The 3rd CIMMEC was held in the city of Gramado, Rio Grande do Sul, Brazil. Anticipating the interest and enthusiasm of the technical-scientific community, the Organizing Institutions invite people and organizations to participate in this important congress, reiterating the commitment to organize an event according to highest international standards. This event has been conceived to integrate people and organizations from Brazil and abroad in the discussion of advanced themes in metrology. Manufacturers and dealers of measuring equipment and standards, as well as of auxiliary accessories and bibliographic material, had the chance to promote their products and services in stands at the Fair, which has taken place alongside the Congress. The 3rd CIMMEC consisted of five Keynote Speeches and 116 regular papers. Among the regular papers, the 25 most outstanding ones, comprising a high quality content on Mechanical Metrology, were selected to be published in this issue of Journal of Physics: Conference Series. It is our great pleasure to present this volume of Journal of Physics: Conference Series to the scientific community to promote further research in Mechanical Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by CIMMEC 2014.

3D active stabilization system with sub-micrometer resolution.

PubMed

Kursu, Olli; Tuukkanen, Tuomas; Rahkonen, Timo; Vähäsöyrinki, Mikko

2012-01-01

Stable positioning between a measurement probe and its target from sub- to few micrometer scales has become a prerequisite in precision metrology and in cellular level measurements from biological tissues. Here we present a 3D stabilization system based on an optoelectronic displacement sensor and custom piezo-actuators driven by a feedback control loop that constantly aims to zero the relative movement between the sensor and the target. We used simulations and prototyping to characterize the developed system. Our results show that 95% attenuation of movement artifacts is achieved at 1 Hz with stabilization performance declining to ca. 70% attenuation at 10 Hz. Stabilization bandwidth is limited by mechanical resonances within the displacement sensor that occur at relatively low frequencies, and are attributable to the sensor's high force sensitivity. We successfully used brain derived micromotion trajectories as a demonstration of complex movement stabilization. The micromotion was reduced to a level of ∼1 µm with nearly 100 fold attenuation at the lower frequencies that are typically associated with physiological processes. These results, and possible improvements of the system, are discussed with a focus on possible ways to increase the sensor's force sensitivity without compromising overall system bandwidth.

3D Active Stabilization System with Sub-Micrometer Resolution

PubMed Central

Rahkonen, Timo; Vähäsöyrinki, Mikko

2012-01-01

Stable positioning between a measurement probe and its target from sub- to few micrometer scales has become a prerequisite in precision metrology and in cellular level measurements from biological tissues. Here we present a 3D stabilization system based on an optoelectronic displacement sensor and custom piezo-actuators driven by a feedback control loop that constantly aims to zero the relative movement between the sensor and the target. We used simulations and prototyping to characterize the developed system. Our results show that 95 % attenuation of movement artifacts is achieved at 1 Hz with stabilization performance declining to ca. 70 % attenuation at 10 Hz. Stabilization bandwidth is limited by mechanical resonances within the displacement sensor that occur at relatively low frequencies, and are attributable to the sensor's high force sensitivity. We successfully used brain derived micromotion trajectories as a demonstration of complex movement stabilization. The micromotion was reduced to a level of ∼1 µm with nearly 100 fold attenuation at the lower frequencies that are typically associated with physiological processes. These results, and possible improvements of the system, are discussed with a focus on possible ways to increase the sensor's force sensitivity without compromising overall system bandwidth. PMID:22900045

FOREWORD: Special issue on radionuclide metrology

NASA Astrophysics Data System (ADS)

Simpson, Bruce; Judge, Steven

2007-08-01

This special issue of Metrologia on radionuclide metrology is the first of a trilogy on the subject of ionizing radiation measurement, a field that is overseen by Sections I, II and III of the CIPM's Consultative Committee for Ionizing Radiation (CCRI). The idea was first proposed at the 2003 series of CCRI Section meetings, with the general aim of showcasing the relevance and importance of metrology in ionizing radiation to a broader metrological audience. After the 2005 meeting of Section II (measurement of radionuclides), the radioactivity aspect of the project began to move forward in earnest. A working group was set up with the brief that the special issue should be of use by experienced metrologists as an overview of the 'state of the art' to compare progress and scientific content with those in other fields of metrology, as a resource for new metrologists joining the field and as a guide for users of radioactivity to explain how traceability to the international measurement system may be achieved. Since mankind first became aware of the existence of radioactivity just over a century ago (due to its discovery by Becquerel and further work by the Curies), much has been learnt and understood in the interim period. The field of radionuclide metrology that developed subsequently is broad-based and encompasses, amongst others, nuclear physics (experimental and theory), chemistry, mathematics, mathematical statistics, uncertainty analysis and advanced computing for data analysis, simulation and modelling. To determine the activity of radionuclides accurately requires elements of all of these subjects. In more recent decades the focus has been on the practical applications of radioactivity in industry and the health field in particular. In addition, low-level environmental radioactivity monitoring has taken on ever greater importance in the nuclear power era. These developments have required new detection instrumentation and techniques on an ongoing basis to ensure the improvement in accuracy and precision of measurement as demanded by the stringent requirements of the user community, such as the correct calibration of nuclear instrumentation. This leads into the need for traceability to national measurement standards maintained by the national metrology institutes. As part of the radioactivity traceability chain, as for all areas of metrology, it is vital that systems are in place to ensure that national standards can be checked for worldwide uniformity and measurement equivalence. Many of the resulting areas are covered by the topics in this special issue, although specifically excluded from the scope of the publication are topics that are widely covered in other publications due to their application in applied metrology—for example, radiochemistry, environmental gamma spectrometry and alpha spectrometry. There are three sections to this issue, starting with papers on how the CIPM Mutual Recognition Arrangement has been implemented for radionuclide metrology, following into the bulk of the publication with articles on the `state of the art' in radionuclide metrology and ending with traceability to national/international standards in nuclear medicine, environmental monitoring, radiation protection and decommissioning. This special issue in essence follows on from earlier BIPM Monographies that were published in order to provide the base information for radionuclide metrology. In many respects they complement the special issue since much of their content is still valid today, particularly those published more recently as an aid to ensuring consistency of method and data. The BIPM Monographies are freely available to download from the BIPM website at http://www.bipm.org/en/publications/monographies-ri.html. The papers in the special issue draw on the experience of radionuclide metrologists who have been involved in their area of expertise for many years. The authors give readers an insightful account of the selected topics through in-depth review articles. We are indeed indebted to them for accepting this difficult and time-consuming task and also thank the many researchers recognized in the articles who have contributed to expanding the field over many years. The considerable effort put into this issue would not have been possible without input from the appointed referees, as well as the project team also comprising Yoshio Hino, Jose-Marie Los Arcos, Mike Unterweger and Brian Zimmerman. Thanks are also due to the Metrologia Editor, Jeffrey Williams, and the editorial staff for their sterling efforts in keeping the issue on track and the publication on schedule. Last, but not least, we thank Prof. Georgio Moscati, President of the CCRI, and Dr Penny Allisy-Roberts, Executive Secretary of the CCRI, for their continuous interest and support for the project.

FPGA-Based Smart Sensor for Online Displacement Measurements Using a Heterodyne Interferometer

PubMed Central

Vera-Salas, Luis Alberto; Moreno-Tapia, Sandra Veronica; Garcia-Perez, Arturo; de Jesus Romero-Troncoso, Rene; Osornio-Rios, Roque Alfredo; Serroukh, Ibrahim; Cabal-Yepez, Eduardo

2011-01-01

The measurement of small displacements on the nanometric scale demands metrological systems of high accuracy and precision. In this context, interferometer-based displacement measurements have become the main tools used for traceable dimensional metrology. The different industrial applications in which small displacement measurements are employed requires the use of online measurements, high speed processes, open architecture control systems, as well as good adaptability to specific process conditions. The main contribution of this work is the development of a smart sensor for large displacement measurement based on phase measurement which achieves high accuracy and resolution, designed to be used with a commercial heterodyne interferometer. The system is based on a low-cost Field Programmable Gate Array (FPGA) allowing the integration of several functions in a single portable device. This system is optimal for high speed applications where online measurement is needed and the reconfigurability feature allows the addition of different modules for error compensation, as might be required by a specific application. PMID:22164040

JPRS Report, Science & Technology, USSR: Science & Technology Policy

DTIC Science & Technology

1988-04-05

associa- tions—were formulated. Specialists, A. V. Glichev, direc- tor of the All-Union Institute of Metrology and Stan- dardization of the USSR State...Various functional subdi- visions—laboratories of reliability, metrological labora- tories, monitoring and diagnostic centers, and so forth— are...department for standards, metrology , and quality. The latter annually does not approve and sends back for modification up to 20 of the "notebooks of

In-Process Metrology And Control Of Large Optical Grinders

NASA Astrophysics Data System (ADS)

Anderson, D. S.; Ketelsen, D.; Kittrell, W. Cary; Kuhn, Wm; Parks, R. E.; Stahl, P.

1987-01-01

The advent of rapid figure generation at the University of Arizona has prompted the development of rapid metrology techniques. The success and efficiency of the generating process is highly dependent on timely and accurate measurements to update the feedback loop between machine and optician. We will describe the advantages and problems associated with the in-process metrology and control systems used at the Optical Sciences Center.

Scatterometry-based metrology for SAQP pitch walking using virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-03-01

Advanced technology nodes, 10nm and beyond, employing multi-patterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. Self-Aligned Quadruple Patterning (SAQP) process is used to create the Fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bares compounding effects from successive Reactive Ion Etch (RIE) and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes which work on an assumption that there is consistent spacing between fins. In SAQP there are 3 pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology such as Transmission Electron Microscopy (TEM). In this paper we will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-10-01

Advanced technology nodes, 10 nm and beyond, employing multipatterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. A self-aligned quadruple patterning (SAQP) process is used to create the fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bears the compounding effects from successive reactive ion etch and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes, which work on an assumption that there is consistent spacing between fins. In SAQP, there are three pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology, such as transmission electron microscopy. We will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

A Cryogenic Waveguide Mount for Microstrip Circuit and Material Characterization

NASA Technical Reports Server (NTRS)

U-yen, Kongpop; Brown, Ari D.; Moseley, Samuel H.; Noroozian, Omid; Wollack, Edward J.

2016-01-01

A waveguide split-block fixture used in the characterization of thin-film superconducting planar circuitry at millimeter wavelengths is described in detail. The test fixture is realized from a pair of mode converters, which transition from rectangular-waveguide to on-chip microstrip-line signal propagation via a stepped ridge-guide impedance transformer. The observed performance of the W-band package at 4.2K has a maximum in-band transmission ripple of 2dB between 1.53 and 1.89 times the waveguide cutoff frequency. This metrology approach enables the characterization of superconducting microstrip test structures as a function temperature and frequency. The limitations of the method are discussed and representative data for superconducting Nb and NbTiN thin film microstrip resonators on single-crystal Si dielectric substrates are presented.

Mechanical Stability Study for Integrable Optics Test Accelerator at Fermilab

DOE Office of Scientific and Technical Information (OSTI.GOV)

McGee, Mike; Andrews, Richard; Carlson, Kermit

2016-07-01

The Integrable Optics Test Accelerator (IOTA) is proposed for operation at Fermilab. The goal of IOTA is to create practical nonlinear accelerator focusing systems with a large frequency spread and stable particle motion. The IOTA is a 40 m circumference, 150 MeV (e-), 2.5 MeV (p⁺) diagnostic test ring. A heavy low frequency steel floor girder is proposed as the primary tier for IOTA device component support. Two design lengths; (8) 4 m and (2) 2.8 m long girders with identical cross section completely encompass the ring. This study focuses on the 4 m length girder and the development ofmore » a working prototype. Hydrostatic Level Sensor (HLS), temperature, metrology and fast motion measurements characterize the anticipated mechanical stability of the IOTA ring.« less

Manufacturing and metrology for IR conformal windows and domes

NASA Astrophysics Data System (ADS)

Ferralli, Ian; Blalock, Todd; Brunelle, Matt; Lynch, Timothy; Myer, Brian; Medicus, Kate

2017-05-01

Freeform and conformal optics have the potential to dramatically improve optical systems by enabling systems with fewer optical components, reduced aberrations, and improved aerodynamic performance. These optical components differ from standard components in their surface shape, typically a non-symmetric equation based definition, and material properties. Traditional grinding and polishing tools are unable to handle these freeform shapes. Additionally, standard metrology tools cannot measure these surfaces. Desired substrates are typically hard ceramics, including poly-crystalline alumina or aluminum oxynitride. Notwithstanding the challenges that the hardness provides to manufacturing, these crystalline materials can be highly susceptible to grain decoration creating unacceptable scatter in optical systems. In this presentation, we will show progress towards addressing the unique challenges of manufacturing conformal windows and domes. Particular attention is given to our robotic polishing platform. This platform is based on an industrial robot adapted to accept a wide range of tooling and parts. The robot's flexibility has provided us an opportunity to address the unique challenges of conformal windows. Slurries and polishing active layers can easily be changed to adapt to varying materials and address grain decoration. We have the flexibility to change tool size and shape to address the varying sizes and shapes of conformal optics. In addition, the robotic platform can be a base for a deflectometry-based metrology tool to measure surface form error. This system, whose precision is independent of the robot's positioning accuracy, will allow us to measure optics in-situ saving time and reducing part risk. In conclusion, we will show examples of the conformal windows manufactured using our developed processes.

The New Kilogram Definition and its Implications for High-Precision Mass Tolerance Classes.

PubMed

Abbott, Patrick J; Kubarych, Zeina J

2013-01-01

The SI unit of mass, the kilogram, is the only remaining artifact definition in the seven fundamental units of the SI system. It will be redefined in terms of the Planck constant as soon as certain experimental conditions, based on recommendations of the Consultative Committee for Mass and Related Quantities (CCM) are met. To better reflect reality, the redefinition will likely be accompanied by an increase in the uncertainties that National Metrology Institutes (NMIs) pass on to customers via artifact dissemination, which could have an impact on the reference standards that are used by secondary calibration laboratories if certain weight tolerances are adopted for use. This paper will compare the legal metrology requirements for precision mass calibration laboratories after the kilogram is redefined with the current capabilities based on the international prototype kilogram (IPK) realization of the kilogram.

A review of the quantum current standard

NASA Astrophysics Data System (ADS)

Kaneko, Nobu-Hisa; Nakamura, Shuji; Okazaki, Yuma

2016-03-01

The electric current, voltage, and resistance standards are the most important standards related to electricity and magnetism. Of these three standards, only the ampere, which is the unit of electric current, is an International System of Units (SI) base unit. However, even with modern technology, relatively large uncertainty exists regarding the generation and measurement of current. As a result of various innovative techniques based on nanotechnology and novel materials, new types of junctions for quantum current generation and single-electron current sources have recently been proposed. These newly developed methods are also being used to investigate the consistency of the three quantum electrical effects, i.e. the Josephson, quantum Hall, and single-electron tunneling effects, which are also known as ‘the quantum metrology triangle’. This article describes recent research and related developments regarding current standards and quantum-metrology-triangle experiments.

Improving automated 3D reconstruction methods via vision metrology

NASA Astrophysics Data System (ADS)

Toschi, Isabella; Nocerino, Erica; Hess, Mona; Menna, Fabio; Sargeant, Ben; MacDonald, Lindsay; Remondino, Fabio; Robson, Stuart

2015-05-01

This paper aims to provide a procedure for improving automated 3D reconstruction methods via vision metrology. The 3D reconstruction problem is generally addressed using two different approaches. On the one hand, vision metrology (VM) systems try to accurately derive 3D coordinates of few sparse object points for industrial measurement and inspection applications; on the other, recent dense image matching (DIM) algorithms are designed to produce dense point clouds for surface representations and analyses. This paper strives to demonstrate a step towards narrowing the gap between traditional VM and DIM approaches. Efforts are therefore intended to (i) test the metric performance of the automated photogrammetric 3D reconstruction procedure, (ii) enhance the accuracy of the final results and (iii) obtain statistical indicators of the quality achieved in the orientation step. VM tools are exploited to integrate their main functionalities (centroid measurement, photogrammetric network adjustment, precision assessment, etc.) into the pipeline of 3D dense reconstruction. Finally, geometric analyses and accuracy evaluations are performed on the raw output of the matching (i.e. the point clouds) by adopting a metrological approach. The latter is based on the use of known geometric shapes and quality parameters derived from VDI/VDE guidelines. Tests are carried out by imaging the calibrated Portable Metric Test Object, designed and built at University College London (UCL), UK. It allows assessment of the performance of the image orientation and matching procedures within a typical industrial scenario, characterised by poor texture and known 3D/2D shapes.

Microwave Photonics Systems Based on Whispering-gallery-mode Resonators

PubMed Central

Coillet, Aurélien; Henriet, Rémi; Phan Huy, Kien; Jacquot, Maxime; Furfaro, Luca; Balakireva, Irina; Larger, Laurent; Chembo, Yanne K.

2013-01-01

Microwave photonics systems rely fundamentally on the interaction between microwave and optical signals. These systems are extremely promising for various areas of technology and applied science, such as aerospace and communication engineering, sensing, metrology, nonlinear photonics, and quantum optics. In this article, we present the principal techniques used in our lab to build microwave photonics systems based on ultra-high Q whispering gallery mode resonators. First detailed in this article is the protocol for resonator polishing, which is based on a grind-and-polish technique close to the ones used to polish optical components such as lenses or telescope mirrors. Then, a white light interferometric profilometer measures surface roughness, which is a key parameter to characterize the quality of the polishing. In order to launch light in the resonator, a tapered silica fiber with diameter in the micrometer range is used. To reach such small diameters, we adopt the "flame-brushing" technique, using simultaneously computer-controlled motors to pull the fiber apart, and a blowtorch to heat the fiber area to be tapered. The resonator and the tapered fiber are later approached to one another to visualize the resonance signal of the whispering gallery modes using a wavelength-scanning laser. By increasing the optical power in the resonator, nonlinear phenomena are triggered until the formation of a Kerr optical frequency comb is observed with a spectrum made of equidistant spectral lines. These Kerr comb spectra have exceptional characteristics that are suitable for several applications in science and technology. We consider the application related to ultra-stable microwave frequency synthesis and demonstrate the generation of a Kerr comb with GHz intermodal frequency. PMID:23963358

Microwave photonics systems based on whispering-gallery-mode resonators.

PubMed

Coillet, Aurélien; Henriet, Rémi; Phan Huy, Kien; Jacquot, Maxime; Furfaro, Luca; Balakireva, Irina; Larger, Laurent; Chembo, Yanne K

2013-08-05

Microwave photonics systems rely fundamentally on the interaction between microwave and optical signals. These systems are extremely promising for various areas of technology and applied science, such as aerospace and communication engineering, sensing, metrology, nonlinear photonics, and quantum optics. In this article, we present the principal techniques used in our lab to build microwave photonics systems based on ultra-high Q whispering gallery mode resonators. First detailed in this article is the protocol for resonator polishing, which is based on a grind-and-polish technique close to the ones used to polish optical components such as lenses or telescope mirrors. Then, a white light interferometric profilometer measures surface roughness, which is a key parameter to characterize the quality of the polishing. In order to launch light in the resonator, a tapered silica fiber with diameter in the micrometer range is used. To reach such small diameters, we adopt the "flame-brushing" technique, using simultaneously computer-controlled motors to pull the fiber apart, and a blowtorch to heat the fiber area to be tapered. The resonator and the tapered fiber are later approached to one another to visualize the resonance signal of the whispering gallery modes using a wavelength-scanning laser. By increasing the optical power in the resonator, nonlinear phenomena are triggered until the formation of a Kerr optical frequency comb is observed with a spectrum made of equidistant spectral lines. These Kerr comb spectra have exceptional characteristics that are suitable for several applications in science and technology. We consider the application related to ultra-stable microwave frequency synthesis and demonstrate the generation of a Kerr comb with GHz intermodal frequency.

Laser metrology and optic active control system for GAIA

NASA Astrophysics Data System (ADS)

D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

2017-11-01

The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

Digital terrain modeling and industrial surface metrology: Converging realms

USGS Publications Warehouse

Pike, R.J.

2001-01-01

Digital terrain modeling has a micro-and nanoscale counterpart in surface metrology, the numerical characterization of industrial surfaces. Instrumentation in semiconductor manufacturing and other high-technology fields can now contour surface irregularities down to the atomic scale. Surface metrology has been revolutionized by its ability to manipulate square-grid height matrices that are analogous to the digital elevation models (DEMs) used in physical geography. Because the shaping of industrial surfaces is a spatial process, the same concepts of analytical cartography that represent ground-surface form in geography evolved independently in metrology: The surface topography of manufactured components, exemplified here by automobile-engine cylinders, is routinely modeled by variogram analysis, relief shading, and most other techniques of parameterization and visualization familiar to geography. This article introduces industrial surface-metrology, examines the field in the context of terrain modeling and geomorphology and notes their similarities and differences, and raises theoretical issues to be addressed in progressing toward a unified practice of surface morphometry.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

NASA Astrophysics Data System (ADS)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Spectroscopic metrology for isotope composition measurements and transfer standards

NASA Astrophysics Data System (ADS)

Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

2017-04-01

The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H/1H ratios in CH4. Here, based on HIGHGAS project results, we present OTSs for atmospheric CO2 and CO measurements. The results delivered by the OTSs are in excellent agreement with gravimetric values of metrological "primary" static gas standards. The repeatabilities of the OTS results are matching the compatibility goals stated by WMO for atmospheric CO2 and CO measurements. In addition, we present OIRS measurement methods and procedures to demonstrate their applicability and validation. The requirements on, e.g. absorption line data quality and temperature sensitivity of isotope ratio, are discussed. Uncertainty budgets are presented and the traceability of the results is addressed. The current limitations in our measurements are discussed and steps taken to address these limitations are presented. Acknowledgement Parts of this work have been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] EMRP project ENV52-HIGHGAS, available at: http://www.euramet.org/ [2] Prosenjit Ghosh, Willi A. Brand, International Journal of Mass Spectrometry 228, 1-33 (2003).

Metrology - Beyond the Calibration Lab

NASA Technical Reports Server (NTRS)

Mimbs, Scott M.

2008-01-01

We rely on data from measurements every day; a gas-pump, a speedometer, and a supermarket weight scale are just three examples of measurements we use to make decisions. We generally accept the data from these measurements as "valid." One reason we can accept the data is the "legal metrology" requirements established and regulated by the government in matters of commerce. The measurement data used by NASA, other government agencies, and industry can be critical to decisions which affect everything from economic viability, to mission success, to the security of the nation. Measurement data can even affect life and death decisions. Metrology requirements must adequately provide for risks associated with these decisions. To do this, metrology must be integrated into all aspects of an industry including research, design, testing, and product acceptance. Metrology, the science of measurement, has traditionally focused on the calibration of instruments, and although instrument calibration is vital, it is only a part of the process that assures quality in measurement data. For example, measurements made in research can influence the fundamental premises that establish the design parameters, which then flow down to the manufacturing processes, and eventually impact the final product. Because a breakdown can occur anywhere within this cycle, measurement quality assurance has to be integrated into every part of the life-cycle process starting with the basic research and ending with the final product inspection process. The purpose of this paper is to discuss the role of metrology in the various phases of a product's life-cycle. For simplicity, the cycle will be divided in four broad phases, with discussions centering on metrology within NASA. .

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Settens, Charles M.

2015-01-01

Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron criticalmore » dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.« less

A Study on Performance and Safety Tests of Electrosurgical Equipment

PubMed Central

Tavakoli Golpaygani, A.; Movahedi, M.M.; Reza, M.

2016-01-01

Introduction: Modern medicine employs a wide variety of instruments with different physiological effects and measurements. Periodic verifications are routinely used in legal metrology for industrial measuring instruments. The correct operation of electrosurgical generators is essential to ensure patient’s safety and management of the risks associated with the use of high and low frequency electrical currents on human body. Material and Methods: The metrological reliability of 20 electrosurgical equipment in six hospitals (3 private and 3 public) was evaluated in one of the provinces of Iran according to international and national standards. Results: The achieved results show that HF leakage current of ground-referenced generators are more than isolated generators and the power analysis of only eight units delivered acceptable output values and the precision in the output power measurements was low. Conclusion: Results indicate a need for new and severe regulations on periodic performance verifications and medical equipment quality control program especially in high risk instruments. It is also necessary to provide training courses for operating staff in the field of meterology in medicine to be acquianted with critical parameters to get accuracy results with operation room equipment. PMID:27853725

Quantum Discord Determines the Interferometric Power of Quantum States

NASA Astrophysics Data System (ADS)

Girolami, Davide; Souza, Alexandre M.; Giovannetti, Vittorio; Tufarelli, Tommaso; Filgueiras, Jefferson G.; Sarthour, Roberto S.; Soares-Pinto, Diogo O.; Oliveira, Ivan S.; Adesso, Gerardo

2014-05-01

Quantum metrology exploits quantum mechanical laws to improve the precision in estimating technologically relevant parameters such as phase, frequency, or magnetic fields. Probe states are usually tailored to the particular dynamics whose parameters are being estimated. Here we consider a novel framework where quantum estimation is performed in an interferometric configuration, using bipartite probe states prepared when only the spectrum of the generating Hamiltonian is known. We introduce a figure of merit for the scheme, given by the worst-case precision over all suitable Hamiltonians, and prove that it amounts exactly to a computable measure of discord-type quantum correlations for the input probe. We complement our theoretical results with a metrology experiment, realized in a highly controllable room-temperature nuclear magnetic resonance setup, which provides a proof-of-concept demonstration for the usefulness of discord in sensing applications. Discordant probes are shown to guarantee a nonzero phase sensitivity for all the chosen generating Hamiltonians, while classically correlated probes are unable to accomplish the estimation in a worst-case setting. This work establishes a rigorous and direct operational interpretation for general quantum correlations, shedding light on their potential for quantum technology.

Digital Phase Meter for a Laser Heterodyne Interferometer

NASA Technical Reports Server (NTRS)

Loya, Frank

2008-01-01

The Digital Phase Meter is based on a modified phase-locked loop. When phase alignment between the reference input and the phase-shifted metrological input is achieved, the loop locks and the phase shift of the digital phase shifter equals the phase difference that one seeks to measure. This digital phase meter is being developed for incorporation into a laser heterodyne interferometer in a metrological apparatus, but could also be adapted to other uses. Relative to prior phase meters of similar capability, including digital ones, this digital phase meter is smaller, less complex, and less expensive. The phase meter has been constructed and tested in the form of a field-programmable gate array (FPGA).

Maintaining and disseminating the kilogram following its redefinition

NASA Astrophysics Data System (ADS)

Stock, M.; Davidson, S.; Fang, H.; Milton, M.; de Mirandés, E.; Richard, P.; Sutton, C.

2017-12-01

The new definition of the kilogram, which is expected to be adopted by the General Conference on Weights and Measures in 2018, will bring some major changes to mass metrology. The most fundamental change will be the replacement of the present artefact-based definition with a universal definition, enabling in principle any National Metrology Institute (NMI) to realize the kilogram. The principles for the realization and dissemination of the kilogram in the revised SI are described in the mise en pratique of the definition of the kilogram. This paper provides some additional information and explains how traceability can be obtained by NMIs that do not operate a primary experiment to realize the definition of the kilogram.

Calibration of space instruments at the Metrology Light Source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Klein, R., E-mail: roman.klein@ptb.de; Fliegauf, R.; Gottwald, A.

2016-07-27

PTB has more than 20 years of experience in the calibration of space-based instruments using synchrotron radiation to cover the UV, VUV and X-ray spectral range. New instrumentation at the electron storage ring Metrology Light Source (MLS) opens up extended calibration possibilities within this framework. In particular, the set-up of a large vacuum vessel that can accommodate entire space instruments opens up new prospects. Moreover, a new facility for the calibration of radiation transfer source standards with a considerably extended spectral range has been put into operation. Besides, characterization and calibration of single components like e.g. mirrors, filters, gratings, andmore » detectors is continued.« less

Probabilistic Metrology Attains Macroscopic Cloning of Quantum Clocks

NASA Astrophysics Data System (ADS)

Gendra, B.; Calsamiglia, J.; Muñoz-Tapia, R.; Bagan, E.; Chiribella, G.

2014-12-01

It has recently been shown that probabilistic protocols based on postselection boost the performances of the replication of quantum clocks and phase estimation. Here we demonstrate that the improvements in these two tasks have to match exactly in the macroscopic limit where the number of clones grows to infinity, preserving the equivalence between asymptotic cloning and state estimation for arbitrary values of the success probability. Remarkably, the cloning fidelity depends critically on the number of rationally independent eigenvalues of the clock Hamiltonian. We also prove that probabilistic metrology can simulate cloning in the macroscopic limit for arbitrary sets of states when the performance of the simulation is measured by testing small groups of clones.

Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

DOE Office of Scientific and Technical Information (OSTI.GOV)

Foucher, J.; Faurie, P.; Dourthe, L.

2011-11-10

The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R and D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials...). Therefore, time for R and D ismore » increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam.In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R and D and production. The final goal for 'chip makers' is to improve yield and save R and D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2{sup nd} part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.« less

Allan Variance Computed in Space Domain: Definition and Application to InSAR Data to Characterize Noise and Geophysical Signal.

PubMed

Cavalié, Olivier; Vernotte, François

2016-04-01

The Allan variance was introduced 50 years ago for analyzing the stability of frequency standards. In addition to its metrological interest, it may be also considered as an estimator of the large trends of the power spectral density (PSD) of frequency deviation. For instance, the Allan variance is able to discriminate different types of noise characterized by different power laws in the PSD. The Allan variance was also used in other fields than time and frequency metrology: for more than 20 years, it has been used in accelerometry, geophysics, geodesy, astrophysics, and even finances. However, it seems that up to now, it has been exclusively applied for time series analysis. We propose here to use the Allan variance on spatial data. Interferometric synthetic aperture radar (InSAR) is used in geophysics to image ground displacements in space [over the synthetic aperture radar (SAR) image spatial coverage] and in time thanks to the regular SAR image acquisitions by dedicated satellites. The main limitation of the technique is the atmospheric disturbances that affect the radar signal while traveling from the sensor to the ground and back. In this paper, we propose to use the Allan variance for analyzing spatial data from InSAR measurements. The Allan variance was computed in XY mode as well as in radial mode for detecting different types of behavior for different space-scales, in the same way as the different types of noise versus the integration time in the classical time and frequency application. We found that radial Allan variance is the more appropriate way to have an estimator insensitive to the spatial axis and we applied it on SAR data acquired over eastern Turkey for the period 2003-2011. Spatial Allan variance allowed us to well characterize noise features, classically found in InSAR such as phase decorrelation producing white noise or atmospheric delays, behaving like a random walk signal. We finally applied the spatial Allan variance to an InSAR time series to detect when the geophysical signal, here the ground motion, emerges from the noise.

Phase Synchronization for the Mid-Frequency Square Kilometre Array Telescope

NASA Astrophysics Data System (ADS)

Schediwy, Sascha; Gozzard, David; Stobie, Simon; Gravestock, Charles; Whitaker, Richard; Alachkar, Bassem; Malan, Sias; Boven, Paul; Grainge, Keith

2018-01-01

The Square Kilometre Array (SKA) project is an international effort to build the world’s most sensitive radio telescope operating in the 50 MHz to 14 GHz frequency range. Construction of the SKA has been divided into phases, with the first phase (SKA1) accounting for the first 10% of the telescope's receiving capacity. During SKA1, a low-frequency aperture array comprising over a hundred thousand individual dipole antenna elements will be constructed in Western Australia (SKA1-low), while an array of 197 parabolic-dish antennas, incorporating the 64 dishes of MeerKAT, will be constructed in South Africa (SKA1-mid).Radio telescope arrays such as the SKA require phase-coherent reference signals to be transmitted to each antenna site in the array. In the case of the SKA1-mid, these reference signals will be generated at a central site and transmitted to the antenna sites via fiber-optic cables up to 175 km in length. Environmental perturbations affect the optical path length of the fiber and act to degrade the phase stability of the reference signals received at the antennas, which has the ultimate effect of reducing the fidelity and dynamic range of the data.Since 2011, researchers at the University of Western Australia (UWA) have led the development of an actively-stabilized phase-synchronization system designed specifically to meet the scientific needs and technical challenges of the SKA telescope. Recently this system has been select as the official phase synchronization system for the SKA1-mid telescope. The system is an evolution of Atacama Large Millimeter Array’s distributed ‘photonic local oscillator system’, incorporating key advances made by the international frequency metrology community over the last decade, as well as novel innovations developed by UWA researchers.In this presentation I will describe the technical details of the system; outline how the system's performance was tested using metrology techniques in a laboratory setting, on 186 km of overhead fibre at the South African SKA site, and verified using existing astronomical radio interferometers; and how the system can enhance the astronomical performance of the SKA1-mid telescope.

Image-based overlay and alignment metrology through optically opaque media with sub-surface probe microscopy

NASA Astrophysics Data System (ADS)

van Es, Maarten H.; Mohtashami, Abbas; Piras, Daniele; Sadeghian, Hamed

2018-03-01

Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are covered by optically opaque layers. Moreover, with the device dimensions moving to the smaller nodes and the issue of the so-called loading effect causing offsets between between targets and product features, it is increasingly desirable to perform alignment and overlay on product features or so-called on-cell overlay, which requires higher lateral resolution than optical methods can provide. Our recently developed technique known as SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) has shown the capability for high-resolution imaging of structures below a surface based on (visco-)elasticity of the constituent materials and as such is a promising technique to perform overlay and alignment with high resolution in upcoming production nodes. In this paper, we describe the developed SSURFM technique and the experimental results on imaging buried features through various layers and the ability to detect objects with resolution below 10 nm. In summary, the experimental results show that the SSURFM is a potential solution for on-cell overlay and alignment as well as detecting buried defects or voids and generally metrology through optically opaque layers.

Ice flood velocity calculating approach based on single view metrology

NASA Astrophysics Data System (ADS)

Wu, X.; Xu, L.

2017-02-01

Yellow River is the river in which the ice flood occurs most frequently in China, hence, the Ice flood forecasting has great significance for the river flood prevention work. In various ice flood forecast models, the flow velocity is one of the most important parameters. In spite of the great significance of the flow velocity, its acquisition heavily relies on manual observation or deriving from empirical formula. In recent years, with the high development of video surveillance technology and wireless transmission network, the Yellow River Conservancy Commission set up the ice situation monitoring system, in which live videos can be transmitted to the monitoring center through 3G mobile networks. In this paper, an approach to get the ice velocity based on single view metrology and motion tracking technique using monitoring videos as input data is proposed. First of all, River way can be approximated as a plane. On this condition, we analyze the geometry relevance between the object side and the image side. Besides, we present the principle to measure length in object side from image. Secondly, we use LK optical flow which support pyramid data to track the ice in motion. Combining the result of camera calibration and single view metrology, we propose a flow to calculate the real velocity of ice flood. At last we realize a prototype system by programming and use it to test the reliability and rationality of the whole solution.

Two Approaches to Calibration in Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Campanelli, Mark

2014-04-01

Inferring mathematical relationships with quantified uncertainty from measurement data is common to computational science and metrology. Sufficient knowledge of measurement process noise enables Bayesian inference. Otherwise, an alternative approach is required, here termed compartmentalized inference, because collection of uncertain data and model inference occur independently. Bayesian parameterized model inference is compared to a Bayesian-compatible compartmentalized approach for ISO-GUM compliant calibration problems in renewable energy metrology. In either approach, model evidence can help reduce model discrepancy.

Dynamic metrology and data processing for precision freeform optics fabrication and testing

NASA Astrophysics Data System (ADS)

Aftab, Maham; Trumper, Isaac; Huang, Lei; Choi, Heejoo; Zhao, Wenchuan; Graves, Logan; Oh, Chang Jin; Kim, Dae Wook

2017-06-01

Dynamic metrology holds the key to overcoming several challenging limitations of conventional optical metrology, especially with regards to precision freeform optical elements. We present two dynamic metrology systems: 1) adaptive interferometric null testing; and 2) instantaneous phase shifting deflectometry, along with an overview of a gradient data processing and surface reconstruction technique. The adaptive null testing method, utilizing a deformable mirror, adopts a stochastic parallel gradient descent search algorithm in order to dynamically create a null testing condition for unknown freeform optics. The single-shot deflectometry system implemented on an iPhone uses a multiplexed display pattern to enable dynamic measurements of time-varying optical components or optics in vibration. Experimental data, measurement accuracy / precision, and data processing algorithms are discussed.

Advanced applications of scatterometry based optical metrology

NASA Astrophysics Data System (ADS)

Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

2017-03-01

The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements provide an excellent means of measuring asymmetry present in the structure. The useful additional information as well as symmetry-antisymmetry properties of MM elements is used to characterize fin bending, overlay defects and design improvements in the OCD test structures are used to boost OCDs' sensitivity to pitch-walking. In addition, the validity of the OCD based results is established by comparing the results to the top down critical dimensionscanning electron microscope (CD-SEM) and cross-sectional transmission electron microscope (TEM) images.

Parasitic effects in superconducting quantum interference device-based radiation comb generators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bosisio, R., E-mail: riccardo.bosisio@nano.cnr.it; NEST, Instituto Nanoscienze-CNR and Scuola Normale Superiore, I-56127 Pisa; Giazotto, F., E-mail: giazotto@sns.it

2015-12-07

We study several parasitic effects on the implementation of a Josephson radiation comb generator based on a dc superconducting quantum interference device (SQUID) driven by an external magnetic field. This system can be used as a radiation generator similarly to what is done in optics and metrology, and allows one to generate up to several hundreds of harmonics of the driving frequency. First we take into account how the assumption of a finite loop geometrical inductance and junction capacitance in each SQUID may alter the operation of the devices. Then, we estimate the effect of imperfections in the fabrication ofmore » an array of SQUIDs, which is an unavoidable source of errors in practical situations. We show that the role of the junction capacitance is, in general, negligible, whereas the geometrical inductance has a beneficial effect on the performance of the device. The errors on the areas and junction resistance asymmetries may deteriorate the performance, but their effect can be limited to a large extent by a suitable choice of fabrication parameters.« less

Parametric boundary reconstruction algorithm for industrial CT metrology application.

PubMed

Yin, Zhye; Khare, Kedar; De Man, Bruno

2009-01-01

High-energy X-ray computed tomography (CT) systems have been recently used to produce high-resolution images in various nondestructive testing and evaluation (NDT/NDE) applications. The accuracy of the dimensional information extracted from CT images is rapidly approaching the accuracy achieved with a coordinate measuring machine (CMM), the conventional approach to acquire the metrology information directly. On the other hand, CT systems generate the sinogram which is transformed mathematically to the pixel-based images. The dimensional information of the scanned object is extracted later by performing edge detection on reconstructed CT images. The dimensional accuracy of this approach is limited by the grid size of the pixel-based representation of CT images since the edge detection is performed on the pixel grid. Moreover, reconstructed CT images usually display various artifacts due to the underlying physical process and resulting object boundaries from the edge detection fail to represent the true boundaries of the scanned object. In this paper, a novel algorithm to reconstruct the boundaries of an object with uniform material composition and uniform density is presented. There are three major benefits in the proposed approach. First, since the boundary parameters are reconstructed instead of image pixels, the complexity of the reconstruction algorithm is significantly reduced. The iterative approach, which can be computationally intensive, will be practical with the parametric boundary reconstruction. Second, the object of interest in metrology can be represented more directly and accurately by the boundary parameters instead of the image pixels. By eliminating the extra edge detection step, the overall dimensional accuracy and process time can be improved. Third, since the parametric reconstruction approach shares the boundary representation with other conventional metrology modalities such as CMM, boundary information from other modalities can be directly incorporated as prior knowledge to improve the convergence of an iterative approach. In this paper, the feasibility of parametric boundary reconstruction algorithm is demonstrated with both simple and complex simulated objects. Finally, the proposed algorithm is applied to the experimental industrial CT system data.

Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Barber, Samuel; Domning, Edward E.

2009-06-15

Development of X-ray optics for 3rd and 4th generation X-ray light sources with a level of surface slope precision of 0.1-0.2 {micro}rad requires the development of adequate fabrication technologies and dedicated metrology instrumentation and methods. Currently, the best performance of surface slope measurement has been achieved with the NOM (Nanometer Optical Component Measuring Machine) slope profiler at BESSY (Germany) [1] and the ESAD (Extended Shear Angle Difference) profiler at the PTB (Germany) [2]. Both instruments are based on electronic autocollimators (AC) precisely calibrated for the specific application [3] with small apertures of 2.5-5 mm in diameter. In the present work,more » we describe the design, initial alignment and calibration procedures, the instrumental control and data acquisition system, as well as the measurement performance of the Developmental Long Trace Profiler (DLTP) slope measuring instrument recently brought into operation at the Advanced Light Source (ALS) Optical Metrology Laboratory (OML). Similar to the NOM and ESAD, the DLTP is based on a precisely calibrated autocollimator. However, this is a reasonably low budget instrument used at the ALS OML for the development and testing of new measuring techniques and methods. Some of the developed methods have been implemented into the ALS LTP-II (slope measuring long trace profiler [4]) which was recently upgraded and has demonstrated a capability for 0.25 {micro}rad surface metrology [5]. Performance of the DLTP was verified via a number of measurements with high quality reference mirrors. A comparison with the corresponding results obtained with the world's best slope measuring instrument, the BESSY NOM, proves the accuracy of the DLTP measurements on the level of 0.1-0.2 {micro}rad depending on the curvature of a surface under test. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.« less

MSTAR: an absolute metrology sensor with sub-micron accuracy for space-based applications

NASA Technical Reports Server (NTRS)

Peters, Robert D.; Lay, Oliver P.; Dubovitsky, Serge; Burger, Johan P.; Jeganathan, Muthu

2004-01-01

The MSTAR sensor is a new system for measuring absolute distance, capable of resolving the integer cycle ambiguity of standard interferometers, and making it possible to measure distance with subnanometer accuracy.

Simultaneous acquisition of 3D shape and deformation by combination of interferometric and correlation-based laser speckle metrology.

PubMed

Dekiff, Markus; Berssenbrügge, Philipp; Kemper, Björn; Denz, Cornelia; Dirksen, Dieter

2015-12-01

A metrology system combining three laser speckle measurement techniques for simultaneous determination of 3D shape and micro- and macroscopic deformations is presented. While microscopic deformations are determined by a combination of Digital Holographic Interferometry (DHI) and Digital Speckle Photography (DSP), macroscopic 3D shape, position and deformation are retrieved by photogrammetry based on digital image correlation of a projected laser speckle pattern. The photogrammetrically obtained data extend the measurement range of the DHI-DSP system and also increase the accuracy of the calculation of the sensitivity vector. Furthermore, a precise assignment of microscopic displacements to the object's macroscopic shape for enhanced visualization is achieved. The approach allows for fast measurements with a simple setup. Key parameters of the system are optimized, and its precision and measurement range are demonstrated. As application examples, the deformation of a mandible model and the shrinkage of dental impression material are measured.

A squeezed light source operated under high vacuum

PubMed Central

Wade, Andrew R.; Mansell, Georgia L.; Chua, Sheon S. Y.; Ward, Robert L.; Slagmolen, Bram J. J.; Shaddock, Daniel A.; McClelland, David E.

2015-01-01

Non-classical squeezed states of light are becoming increasingly important to a range of metrology and other quantum optics applications in cryptography, quantum computation and biophysics. Applications such as improving the sensitivity of advanced gravitational wave detectors and the development of space-based metrology and quantum networks will require robust deployable vacuum-compatible sources. To date non-linear photonics devices operated under high vacuum have been simple single pass systems, testing harmonic generation and the production of classically correlated photon pairs for space-based applications. Here we demonstrate the production under high-vacuum conditions of non-classical squeezed light with an observed 8.6 dB of quantum noise reduction down to 10 Hz. Demonstration of a resonant non-linear optical device, for the generation of squeezed light under vacuum, paves the way to fully exploit the advantages of in-vacuum operations, adapting this technology for deployment into new extreme environments. PMID:26657616

Speckle noise reduction in quantitative optical metrology techniques by application of the discrete wavelet transformation

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Pryputniewicz, Ryszard J.

2002-06-01

Effective suppression of speckle noise content in interferometric data images can help in improving accuracy and resolution of the results obtained with interferometric optical metrology techniques. In this paper, novel speckle noise reduction algorithms based on the discrete wavelet transformation are presented. The algorithms proceed by: (a) estimating the noise level contained in the interferograms of interest, (b) selecting wavelet families, (c) applying the wavelet transformation using the selected families, (d) wavelet thresholding, and (e) applying the inverse wavelet transformation, producing denoised interferograms. The algorithms are applied to the different stages of the processing procedures utilized for generation of quantitative speckle correlation interferometry data of fiber-optic based opto-electronic holography (FOBOEH) techniques, allowing identification of optimal processing conditions. It is shown that wavelet algorithms are effective for speckle noise reduction while preserving image features otherwise faded with other algorithms.

Research on volume metrology method of large vertical energy storage tank based on internal electro-optical distance-ranging method

NASA Astrophysics Data System (ADS)

Hao, Huadong; Shi, Haolei; Yi, Pengju; Liu, Ying; Li, Cunjun; Li, Shuguang

2018-01-01

A Volume Metrology method based on Internal Electro-optical Distance-ranging method is established for large vertical energy storage tank. After analyzing the vertical tank volume calculation mathematical model, the key processing algorithms, such as gross error elimination, filtering, streamline, and radius calculation are studied for the point cloud data. The corresponding volume values are automatically calculated in the different liquids by calculating the cross-sectional area along the horizontal direction and integrating from vertical direction. To design the comparison system, a vertical tank which the nominal capacity is 20,000 m3 is selected as the research object, and there are shown that the method has good repeatability and reproducibility. Through using the conventional capacity measurement method as reference, the relative deviation of calculated volume is less than 0.1%, meeting the measurement requirements. And the feasibility and effectiveness are demonstrated.

A squeezed light source operated under high vacuum

NASA Astrophysics Data System (ADS)

Wade, Andrew R.; Mansell, Georgia L.; Chua, Sheon S. Y.; Ward, Robert L.; Slagmolen, Bram J. J.; Shaddock, Daniel A.; McClelland, David E.

2015-12-01

Non-classical squeezed states of light are becoming increasingly important to a range of metrology and other quantum optics applications in cryptography, quantum computation and biophysics. Applications such as improving the sensitivity of advanced gravitational wave detectors and the development of space-based metrology and quantum networks will require robust deployable vacuum-compatible sources. To date non-linear photonics devices operated under high vacuum have been simple single pass systems, testing harmonic generation and the production of classically correlated photon pairs for space-based applications. Here we demonstrate the production under high-vacuum conditions of non-classical squeezed light with an observed 8.6 dB of quantum noise reduction down to 10 Hz. Demonstration of a resonant non-linear optical device, for the generation of squeezed light under vacuum, paves the way to fully exploit the advantages of in-vacuum operations, adapting this technology for deployment into new extreme environments.

Detector Based Realisation of Illuminance Scale at NML-SIRIM

NASA Astrophysics Data System (ADS)

Abdullah, Mohd Nizam; Abidin, Mohd Nasir Zainal; Abidin, Abdul Rashid Zainal; Shaari, Sahbudin

2009-07-01

Illuminance scale is one of the fundamentals in the realisation of candela in optical radiation. The en route of the realisation is based on the fundamental process from the unbroken chain of traceability which includes from the primary standard disseminated to working standard and lastly the end user. There are many variations towards this realisation even though some of the national metrology institutes (NMI) does not have the primary standard but their traceability still valid. The realisation of National Metrology Laboratory SIRIM (NML-SIRIM), Malaysia illuminance scale is based on detector. The scale is traceable to National Physical Labortaory (NPL), United Kingdom (UK) by annually calibrating photometers and luminous intensity lamp. This paper describes measurement method and the system set-up was previously crosschecked with Korea Research Institute Standards and Science (KRISS), Republic of Korea. The agreement between both laboratories is within 0.5% the uncertainty maintained at NML-SIRIM. Furthermore, the basic measurement equation for illuminance realisation is also derived.

High-frequency applications of high-temperature superconductor thin films

NASA Astrophysics Data System (ADS)

Klein, N.

2002-10-01

High-temperature superconducting thin films offer unique properties which can be utilized for a variety of high-frequency device applications in many areas related to the strongly progressing market of information technology. One important property is an exceptionally low level of microwave absorption at temperatures attainable with low power cryocoolers. This unique property has initiated the development of various novel type of microwave devices and commercialized subsystems with special emphasis on application in advanced microwave communication systems. The second important achievement related to efforts in oxide thin and multilayer technology was the reproducible fabrication of low-noise Josephson junctions in high-temperature superconducting thin films. As a consequence of this achievement, several novel nonlinear high-frequency devices, most of them exploiting the unique features of the ac Josephson effect, have been developed and found to exhibit challenging properties to be utilized in basic metrology and Terahertz technology. On the longer timescale, the achievements in integrated high-temperature superconductor circuit technology may offer a strong potential for the development of digital devices with possible clock frequencies in the range of 100 GHz.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

NASA Astrophysics Data System (ADS)

Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

2015-03-01

While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

Effect of metrology time delay on overlay APC

NASA Astrophysics Data System (ADS)

Carlson, Alan; DiBiase, Debra

2002-07-01

The run-to-run control strategy of lithography APC is primarily composed of a feedback loop as shown in the diagram below. It is known that the insertion of a time delay in a feedback loop can cause degradation in control performance and could even cause a stable system to become unstable, if the time delay becomes sufficiently large. Many proponents of integrated metrology methods have cited the damage caused by metrology time delays as the primary justification for moving from a stand-alone to integrated metrology. While there is little dispute over the qualitative form of this argument, there has been very light published about the quantitative effects under real fab conditions - precisely how much control is lost due to these time delays. Another issue regarding time delays is that the length of these delays is not typically fixed - they vary from lot to lot and in some cases this variance can be large - from one hour on the short side to over 32 hours on the long side. Concern has been expressed that the variability in metrology time delays can cause undesirable dynamics in feedback loops that make it difficult to optimize feedback filters and gains and at worst could drive a system unstable. By using data from numerous fabs, spanning many sizes and styles of operation, we have conducted a quantitative study of the time delay effect on overlay run- to-run control. Our analysis resulted in the following conclusions: (1) There is a significant and material relationship between metrology time delay and overlay control under a variety of real world production conditions. (2) The run-to-run controller can be configured to minimize sensitivity to time delay variations. (3) The value of moving to integrated metrology can be quantified.

Metrology Laboratory | Energy Systems Integration Facility | NREL

Science.gov Websites

and artificial) Spectral reflectance and transmission of materials (functional check only , pyrheliometers,* pyranometers,* and pyrgeometers. The Metrology Laboratory provides National Institute of

What metrology can do to improve the quality of your atmospheric ammonia measurements

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

2017-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements, namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures, as well as in the infrastructure to attain metrological traceability, i.e. that the results of measurements are traceable to SI-units through an unbroken chain of calibrations. In the framework of the European Metrology Research Programme (EMRP) project on the topic "Metrology for Ammonia in Ambient Air" (MetNH3), European national metrology institutes (NMI's) have joined to tackle the issue of generating SI-traceable reference material, i.e. generate reference gas mixtures containing known amount fractions of NH3.This requires special infrastructure and analytical techniques: Measurements of ambient ammonia are commonly carried out with diffusive samplers or by active sampling with denuders, but such techniques have not yet been extensively validated. Improvements in the metrological traceability may be achieved through the determination of NH3 diffusive sampling rates using ammonia Primary Standard Gas Mixtures (PSMs), developed by gravimetry at the National Physical Laboratory NPL and a controlled atmosphere test facility in combination with on-line monitoring with a cavity ring-down spectrometer. The Federal Institute of Metrology METAS has developed an infrastructure to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol (atmospheric concentrations) and with uncertainties UNH3 <3%. The infrastructure consists of a stationary as well as a mobile device for full flexibility for calibrations in the laboratory and in the field. Both devices apply the method of temperature and pressure dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Coordinate metrology of a primary surface composite panel from the Large Millimeter Telescope

NASA Astrophysics Data System (ADS)

Gale, David M.; Lucero Álvarez, Maribel; Cabrera Cuevas, Lizeth; Leon-Huerta, Andrea; Arizmendi Reyes, Edgar; Icasio Hernández, Octavio; Castro Santos, David; Hernández Ríos, Emilio; Tecuapetla Sosa, Esteban; Tzile Torres, Carlos; Viliesid Alonso, Miguel

2016-07-01

The Large Millimeter Telescope (LMT) is a single-dish fully-steerable radio telescope presently operating with a 32.5 m parabolic primary reflector, in the process of extension to 50 m. The project is managed by the Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE) in México, and the University of Massachusetts Amherst, USA. A laminated surface panel from the LMT primary reflector has been subjected to a surface measurement assay at Mexico's National Metrology Center (CENAM). Data obtained using a coordinate measuring machine and laser tracker owned by CENAM is compared with measurements using an identical model laser tracker and the photogrammetry technique, the latter systems owned and operated by the LMT. All measurements were performed within the controlled metrology environment at CENAM. The measurement exercise is intended to prepare the groundwork for converting this spare surface panel into a calibrated work-piece. The establishment of a calibrated work-piece provides quality assurance for metrology through measurement traceability. It also simplifies the evaluation of measurement uncertainty for coordinate metrology procedures used by the LMT project during reflector surface qualification.

The role of metrology in mediating and mobilizing the language and culture of scientific facts

NASA Astrophysics Data System (ADS)

Fisher, W. P., Jr.; Stenner, A. J.

2015-02-01

The self-conscious awareness of language and its use is arguably nowhere more intense than in metrology. The careful and deliberate coordination and alignment of shared metrological frames of reference for theory, experiment, and practical application have been characteristics of scientific culture at least since the origins of the SI units in revolutionary France. Though close attention has been focused on the logical and analytical aspects of language use in science, little concern has been shown for understanding how the social and historical aspects of everyday language may have foreshadowed and influenced the development and character of metrological language, especially relative to the inevitably partial knowledge possessed by any given stakeholder participating in the scientific enterprise. Insight in this regard may be helpful in discerning how and if an analogous role for metrology might be created in psychology and the social sciences. It may be that the success of psychology as a science will depend less on taking physics as the relevant model than on attending to the interplay of concepts, models, and social organization that make any culture effective.

Progress of Multi-Beam Long Trace-Profiler Development

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Kilaru, Kiranmayee; Merthe, Daniel J.; Kester, Thomas; McKinney, Wayne R.; Takacs, Peter Z.; Yashchuk, Valeriy V.

2012-01-01

The multi-beam long trace profiler (LTP) under development at NASA s Marshall Space Flight Center[1] is designed to increase the efficiency of metrology of replicated X-ray optics. The traditional LTP operates on a single laser beam that scans along the test surface to detect the slope errors. While capable of exceptional surface slope accuracy, the LTP single beam scanning has slow measuring speed. As metrology constitutes a significant fraction of the time spent in optics production, an increase in the efficiency of metrology helps in decreasing the cost of fabrication of the x-ray optics and in improving their quality. Metrology efficiency can be increased by replacing the single laser beam with multiple beams that can scan a section of the test surface at a single instance. The increase in speed with such a system would be almost proportional to the number of laser beams. A collaborative feasibility study has been made and specifications were fixed for a multi-beam long trace profiler. The progress made in the development of this metrology system is presented.

Geometric errors in 3D optical metrology systems

NASA Astrophysics Data System (ADS)

Harding, Kevin; Nafis, Chris

2008-08-01

The field of 3D optical metrology has seen significant growth in the commercial market in recent years. The methods of using structured light to obtain 3D range data is well documented in the literature, and continues to be an area of development in universities. However, the step between getting 3D data, and getting geometrically correct 3D data that can be used for metrology is not nearly as well developed. Mechanical metrology systems such as CMMs have long established standard means of verifying the geometric accuracies of their systems. Both local and volumentric measurments are characterized on such system using tooling balls, grid plates, and ball bars. This paper will explore the tools needed to characterize and calibrate an optical metrology system, and discuss the nature of the geometric errors often found in such systems, and suggest what may be a viable standard method of doing characterization of 3D optical systems. Finally, we will present a tradeoff analysis of ways to correct geometric errors in an optical systems considering what can be gained by hardware methods versus software corrections.

Optical Metrology for the Segmented Optics on the Constellation-X Spectroscopy X-Ray Telescope

NASA Technical Reports Server (NTRS)

Content, David; Colella, David; Fleetwood, Charles; Hadjimichael, Theo; Lehan, John; McMann, Joseph; Reid, Paul; Saha, Timo; Wright, Geraldine; Zhang, William

2004-01-01

We present the metrology requirements and metrology implementation necessary to prove out the reflector technology for the Constellation X(C-X) spectroscopy X-ray telescope (SXT). This segmented, 1.6m diameter highly nested Wolter-1 telescope presents many metrology and alignment challenges. In particular, these mirrors have a stringent imaging error budget as compared to their intrinsic stiffness; This is required for Constellation-X to have sufficient effective area with the weight requirement. This has implications for the metrology that can be used. A variety of contract and noncontact optical profiling and interferometric methods are combined to test the formed glass substrates before replication and the replicated reflector segments.The reflectors are tested both stand-alone and in-situ in an alignment tower.Some of these methods have not been used on prior X-ray telescopes and some are feasible only because of the segmented approach used on the SXT. Methods discussed include high precision coordinate measurement machines using very low force or optical probe axial interferometric profiling azimuthal circularity profiling and use of advanced null optics such as conical computer generated hologram (CGHs).

Laser Metrology Heterodyne Phase-Locked Loop

NASA Technical Reports Server (NTRS)

Loya, Frank; Halverson, Peter

2009-01-01

A method reduces sensitivity to noise in a signal from a laser heterodyne interferometer. The phase-locked loop (PLL) removes glitches that occur in a zero-crossing detector s output [that can happen if the signal-to-noise ratio (SNR) of the heterodyne signal is low] by the use of an internal oscillator that produces a square-wave signal at a frequency that is inherently close to the heterodyne frequency. It also contains phase-locking circuits that lock the phase of the oscillator to the output of the zero-crossing detector. Because the PLL output is an oscillator signal, it is glitch-free. This enables the ability to make accurate phase measurements in spite of low SNR, creates an immunity to phase error caused by shifts in the heterodyne frequency (i.e. if the target moves causing Doppler shift), and maintains a valid phase even when the signal drops out for brief periods of time, such as when the laser is blocked by a stray object.

Adaptive real-time dual-comb spectroscopy.

PubMed

Ideguchi, Takuro; Poisson, Antonin; Guelachvili, Guy; Picqué, Nathalie; Hänsch, Theodor W

2014-02-27

The spectrum of a laser frequency comb consists of several hundred thousand equally spaced lines over a broad spectral bandwidth. Such frequency combs have revolutionized optical frequency metrology and they now hold much promise for significant advances in a growing number of applications including molecular spectroscopy. Despite an intriguing potential for the measurement of molecular spectra spanning tens of nanometres within tens of microseconds at Doppler-limited resolution, the development of dual-comb spectroscopy is hindered by the demanding stability requirements of the laser combs. Here we overcome this difficulty and experimentally demonstrate a concept of real-time dual-comb spectroscopy, which compensates for laser instabilities by electronic signal processing. It only uses free-running mode-locked lasers without any phase-lock electronics. We record spectra spanning the full bandwidth of near-infrared fibre lasers with Doppler-limited line profiles highly suitable for measurements of concentrations or line intensities. Our new technique of adaptive dual-comb spectroscopy offers a powerful transdisciplinary instrument for analytical sciences.

Adaptive real-time dual-comb spectroscopy

NASA Astrophysics Data System (ADS)

Ideguchi, Takuro; Poisson, Antonin; Guelachvili, Guy; Picqué, Nathalie; Hänsch, Theodor W.

2014-02-01

The spectrum of a laser frequency comb consists of several hundred thousand equally spaced lines over a broad spectral bandwidth. Such frequency combs have revolutionized optical frequency metrology and they now hold much promise for significant advances in a growing number of applications including molecular spectroscopy. Despite an intriguing potential for the measurement of molecular spectra spanning tens of nanometres within tens of microseconds at Doppler-limited resolution, the development of dual-comb spectroscopy is hindered by the demanding stability requirements of the laser combs. Here we overcome this difficulty and experimentally demonstrate a concept of real-time dual-comb spectroscopy, which compensates for laser instabilities by electronic signal processing. It only uses free-running mode-locked lasers without any phase-lock electronics. We record spectra spanning the full bandwidth of near-infrared fibre lasers with Doppler-limited line profiles highly suitable for measurements of concentrations or line intensities. Our new technique of adaptive dual-comb spectroscopy offers a powerful transdisciplinary instrument for analytical sciences.

Adaptive real-time dual-comb spectroscopy

PubMed Central

Ideguchi, Takuro; Poisson, Antonin; Guelachvili, Guy; Picqué, Nathalie; Hänsch, Theodor W.

2014-01-01

The spectrum of a laser frequency comb consists of several hundred thousand equally spaced lines over a broad spectral bandwidth. Such frequency combs have revolutionized optical frequency metrology and they now hold much promise for significant advances in a growing number of applications including molecular spectroscopy. Despite an intriguing potential for the measurement of molecular spectra spanning tens of nanometres within tens of microseconds at Doppler-limited resolution, the development of dual-comb spectroscopy is hindered by the demanding stability requirements of the laser combs. Here we overcome this difficulty and experimentally demonstrate a concept of real-time dual-comb spectroscopy, which compensates for laser instabilities by electronic signal processing. It only uses free-running mode-locked lasers without any phase-lock electronics. We record spectra spanning the full bandwidth of near-infrared fibre lasers with Doppler-limited line profiles highly suitable for measurements of concentrations or line intensities. Our new technique of adaptive dual-comb spectroscopy offers a powerful transdisciplinary instrument for analytical sciences. PMID:24572636

Target-Tracking Camera for a Metrology System

NASA Technical Reports Server (NTRS)

Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

2009-01-01

An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

The Role of a Physical Analysis Laboratory in a 300 mm IC Development and Manufacturing Centre

NASA Astrophysics Data System (ADS)

Kwakman, L. F. Tz.; Bicais-Lepinay, N.; Courtas, S.; Delille, D.; Juhel, M.; Trouiller, C.; Wyon, C.; de la Bardonnie, M.; Lorut, F.; Ross, R.

2005-09-01

To remain competitive IC manufacturers have to accelerate the development of most advanced (CMOS) technology and to deliver high yielding products with best cycle times and at a competitive pricing. With the increase of technology complexity, also the need for physical characterization support increases, however many of the existing techniques are no longer adequate to effectively support the 65-45 nm technology node developments. New and improved techniques are definitely needed to better characterize the often marginal processes, but these should not significantly impact fabrication costs or cycle time. Hence, characterization and metrology challenges in state-of-the-art IC manufacturing are both of technical and economical nature. TEM microscopy is needed for high quality, high volume analytical support but several physical and practical hurdles have to be taken. The success rate of FIB-SEM based failure analysis drops as defects often are too small to be detected and fault isolation becomes more difficult in the nano-scale device structures. To remain effective and efficient, SEM and OBIRCH techniques have to be improved or complemented with other more effective methods. Chemical analysis of novel materials and critical interfaces requires improvements in the field of e.g. SIMS, ToF-SIMS. Techniques that previously were only used sporadically, like EBSD and XRD, have become a `must' to properly support backend process development. At the bright side, thanks to major technical advances, techniques that previously were practiced at laboratory level only now can be used effectively for at-line fab metrology: Voltage Contrast based defectivity control, XPS based gate dielectric metrology and XRD based control of copper metallization processes are practical examples. In this paper capabilities and shortcomings of several techniques and corresponding equipment are presented with practical illustrations of use in our Crolles facilities.

Coherent ultra-violet to near-infrared generation in silica ridge waveguides

PubMed Central

Yoon Oh, Dong; Yang, Ki Youl; Fredrick, Connor; Ycas, Gabriel; Diddams, Scott A.; Vahala, Kerry J.

2017-01-01

Short duration, intense pulses of light can experience dramatic spectral broadening when propagating through lengths of optical fibre. This continuum generation process is caused by a combination of nonlinear optical effects including the formation of dispersive waves. Optical analogues of Cherenkov radiation, these waves allow a pulse to radiate power into a distant spectral region. In this work, efficient and coherent dispersive wave generation of visible to ultraviolet light is demonstrated in silica waveguides on a silicon chip. Unlike fibre broadeners, the arrays provide a wide range of emission wavelength choices on a single, compact chip. This new capability is used to simplify offset frequency measurements of a mode-locked frequency comb. The arrays can also enable mode-locked lasers to attain unprecedented tunable spectral reach for spectroscopy, bioimaging, tomography and metrology. PMID:28067233

Differential Deposition for Surface Figure Corrections in Grazing Incidence X-Ray Optics

NASA Technical Reports Server (NTRS)

Ramsey, Brian D.; Kilaru, Kiranmayee; Atkins, Carolyn; Gubarev, Mikhail V.; Broadway, David M.

2015-01-01

Differential deposition corrects the low- and mid- spatial-frequency deviations in the axial figure of Wolter-type grazing incidence X-ray optics. Figure deviations is one of the major contributors to the achievable angular resolution. Minimizing figure errors can significantly improve the imaging quality of X-ray optics. Material of varying thickness is selectively deposited, using DC magnetron sputtering, along the length of optic to minimize figure deviations. Custom vacuum chambers are built that can incorporate full-shell and segmented Xray optics. Metrology data of preliminary corrections on a single meridian of full-shell x-ray optics show an improvement of mid-spatial frequencies from 6.7 to 1.8 arc secs HPD. Efforts are in progress to correct a full-shell and segmented optics and to verify angular-resolution improvement with X-ray testing.

Theoferometer for the Construction of Precision Optomechanical Assemblies

NASA Technical Reports Server (NTRS)

Korzun, Ashley M.

2006-01-01

The increasing difficulty of metrology requirements on projects involving optics and the alignment of instrumentation on spacecraft has reached a turning point. Requirements as low as 0.1 arcseconds for the static, rotational alignment of components within a coordinate system cannot be met with a theodolite, the alignment tool currently in use. A "theoferometer" is an interferometer mounted on a rotation stage with degrees of freedom in azimuth and elevation for metrology and alignment applications. The success of a prototype theoferometer in approaching these metrology requirements led to a redesign stressing mechanical, optical, and software changes to increase the sensitivity and portability of the unit. This paper covers the improvements made to the first prototype theoferometer, characteristic testing, and demonstration of the redesigned theoferometer s capabilities as a "theodolite replacement" and low-uncertainty metrology tool.

Recent progress in understanding the imaging and metrology using the helium ion microscope

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladar, Andras E.; Ming, Bin

2009-05-01

Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of these barriers. A new tool for imaging and metrology for nanotechnology is the scanning Helium Ion Microscope (HIM). The HIM is a new approach to imaging and metrology for nanotechnology which may be able to push this barrier lower. As a new methodology, it is just beginning to show promise and the number of potentially advantageous applications for nanotechnology and nanometrology has yet to be fully exploited. This presentation will discuss some of the progress made at NIST in collaboration with the manufacturing community in understanding the imaging and metrology for this new technology.

Earthquakes and sea level - Space and terrestrial metrology on a changing planet

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bilham, R.

1991-02-01

A review is presented of the stability and scale of crustal deformation metrology which has particular relevance to monitoring deformation associated with sea level and earthquakes. Developments in space geodesy and crustal deformation metrology in the last two decades have the potential to acquire a homogeneous global data set for monitoring relative horizontal and vertical motions of the earth's surface to within several millimeters. New tools discussed for forecasting sea level rise and damaging earthquakes include: very long baseline interferometry, satellite laser ranging, the principles of GPS geodesy, and new sea level sensors. Space geodesy permits a unified global basismore » for future metrology of the earth, and the continued availability of the GPS is currently fundamental to this unification.« less

CD-SEM real time bias correction using reference metrology based modeling

NASA Astrophysics Data System (ADS)

Ukraintsev, V.; Banke, W.; Zagorodnev, G.; Archie, C.; Rana, N.; Pavlovsky, V.; Smirnov, V.; Briginas, I.; Katnani, A.; Vaid, A.

2018-03-01

Accuracy of patterning impacts yield, IC performance and technology time to market. Accuracy of patterning relies on optical proximity correction (OPC) models built using CD-SEM inputs and intra die critical dimension (CD) control based on CD-SEM. Sub-nanometer measurement uncertainty (MU) of CD-SEM is required for current technologies. Reported design and process related bias variation of CD-SEM is in the range of several nanometers. Reference metrology and numerical modeling are used to correct SEM. Both methods are slow to be used for real time bias correction. We report on real time CD-SEM bias correction using empirical models based on reference metrology (RM) data. Significant amount of currently untapped information (sidewall angle, corner rounding, etc.) is obtainable from SEM waveforms. Using additional RM information provided for specific technology (design rules, materials, processes) CD extraction algorithms can be pre-built and then used in real time for accurate CD extraction from regular CD-SEM images. The art and challenge of SEM modeling is in finding robust correlation between SEM waveform features and bias of CD-SEM as well as in minimizing RM inputs needed to create accurate (within the design and process space) model. The new approach was applied to improve CD-SEM accuracy of 45 nm GATE and 32 nm MET1 OPC 1D models. In both cases MU of the state of the art CD-SEM has been improved by 3x and reduced to a nanometer level. Similar approach can be applied to 2D (end of line, contours, etc.) and 3D (sidewall angle, corner rounding, etc.) cases.

Towards absolute quantification of allergenic proteins in food--lysozyme in wine as a model system for metrologically traceable mass spectrometric methods and certified reference materials.

PubMed

Cryar, Adam; Pritchard, Caroline; Burkitt, William; Walker, Michael; O'Connor, Gavin; Burns, Duncan Thorburn; Quaglia, Milena

2013-01-01

Current routine food allergen quantification methods, which are based on immunochemistry, offer high sensitivity but can suffer from issues of specificity and significant variability of results. MS approaches have been developed, but currently lack metrological traceability. A feasibility study on the application of metrologically traceable MS-based reference procedures was undertaken. A proof of concept involving proteolytic digestion and isotope dilution MS for quantification of protein allergens in a food matrix was undertaken using lysozyme in wine as a model system. A concentration of lysozyme in wine of 0.95 +/- 0.03 microg/g was calculated based on the concentrations of two peptides, confirming that this type of analysis is viable at allergenically meaningful concentrations. The challenges associated with this promising method were explored; these included peptide stability, chemical modification, enzymatic digestion, and sample cleanup. The method is suitable for the production of allergen in food certified reference materials, which together with the achieved understanding of the effects of sample preparation and of the matrix on the final results, will assist in addressing the bias of the techniques routinely used and improve measurement confidence. Confirmation of the feasibility of MS methods for absolute quantification of an allergenic protein in a food matrix with results traceable to the International System of Units is a step towards meaningful comparison of results for allergen proteins among laboratories. This approach will also underpin risk assessment and risk management of allergens in the food industry, and regulatory compliance of the use of thresholds or action levels when adopted.

Enabling CD SEM metrology for 5nm technology node and beyond

NASA Astrophysics Data System (ADS)

Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

2017-03-01

The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with the requirements of the future technology nodes. The root causes of these challenges are not uniquely related to the shrinking CD values, as one might expect, but to the increase in complexity of the devices in terms of morphology and chemical composition as well. In fact, complicated threedimensional device architectures, high aspect ratio features, and wide variety of materials are some of the unavoidable characteristics of the future metrology nodes. This means that, beside an improvement in resolution, it is critical to develop a CD SEM metrology capable of satisfying the specific needs of the devices of the nodes to come, needs that sometimes will have to be addressed through dramatic changes in approach with respect to traditional CD SEM metrology. In this paper, we report on the development of advanced CD SEM metrology at imec on a variety of device platform and processes, for both logic and memories. We discuss newly developed approaches for standard, IIIV, and germanium FinFETs (Fin Field Effect Transistors), for lateral and vertical nanowires (NW), 3D NAND (three-dimensional NAND), STT-MRAM (Spin Transfer Magnetic Torque Random-Access Memory), and ReRAM (Resistive Random Access Memory). Applications for both front-end of line (FEOL) and back-end of line (BEOL) are developed. In terms of process, S/D Epi (Source Drain Epitaxy), SAQP (Self-Aligned Quadruple Patterning), DSA (Dynamic Self-Assembly), and EUVL (Extreme Ultraviolet Lithography) have been used. The work reported here has been performed on Hitachi CG5000, CG6300, and CV5000. In terms of logic, we discuss here the S/D epi defect classification, the metrology optimization for STI (Shallow Trench Isolation) Ge FinFETs, the defectivity of III-V STI FinFETs,, metrology for vertical and horizontal NWs. With respect to memory, we discuss a STT-RAM statistical CD analysis and its comparison to electrical performance, ReRAM metrology for VMCO (Vacancy-modulated conductive oxide) with comparison with electrical performance, 3D NAND ONO (Oxide Nitride Oxide) thickness measurements. In addition, we report on 3D morphological reconstruction using CD SEM in conjunction with FIB (Focused Ion Beam), on optimized BKM (Best Known Methods) development methodologies, and on CD SEM overlay. The large variety of results reported here gives a clear overview of the creative effort put in place to ensure that the critical potential of CD SEM metrology tools is fully enabled for the 5nm node and beyond.

Solar Radiation Research Laboratory | Energy Systems Integration Facility |

Science.gov Websites

radiation components, and has expanded its expertise to include integrated metrology, optics, electronics Acquisition Laboratory, Metrology Laboratory, Optics Laboratory, and Electronics Laboratory. Photo of a

ProSens: integrated production control by automated inspection planning and efficient multisensor metrology

NASA Astrophysics Data System (ADS)

Glaser, Ulf; Li, Zhichao; Bichmann, Stephan, II; Pfeifer, Tilo

2003-05-01

By China's entry into the WTO, Chinese as well as German companies are facing the question, how to minimize the risk of unfamiliar cooperation partners when developing products. The rise of customer demands concerning quality, product diversity and the reduction of expenses require flexibility and efficiency with reliable component suppliers. In order to build and strengthen sino-german cooperations, a manufacturing control using homogenized and efficient measures to assure high quality is of vital importance. Lack of unifications may cause identical measurements conducted at subcontractors or customers to be carried out with different measurement processes which leads to incomparable results. Rapidly growing company cooperations and simultaneously decreasing of manufacturing scope cause substantial difficulties when coordinating joint quality control activities. "ProSens," a sino-german project consortium consisting of industrial users, technology producers and research institutes, aims at improving selected production processes by: Creation of a homogeneous quality awareness in sino-german cooperations. Sensitization for process accompanying metrology at an early stage of product development. Increase of the process performance by the use of integrated metrology. Reduction of production time and cost. Unification of quality control of complex products by means of efficient measurement strategies and CAD-based inspection planning.

Evaluating the effects of modeling errors for isolated finite three-dimensional targets

NASA Astrophysics Data System (ADS)

Henn, Mark-Alexander; Barnes, Bryan M.; Zhou, Hui

2017-10-01

Optical three-dimensional (3-D) nanostructure metrology utilizes a model-based metrology approach to determine critical dimensions (CDs) that are well below the inspection wavelength. Our project at the National Institute of Standards and Technology is evaluating how to attain key CD and shape parameters from engineered in-die capable metrology targets. More specifically, the quantities of interest are determined by varying the input parameters for a physical model until the simulations agree with the actual measurements within acceptable error bounds. As in most applications, establishing a reasonable balance between model accuracy and time efficiency is a complicated task. A well-established simplification is to model the intrinsically finite 3-D nanostructures as either periodic or infinite in one direction, reducing the computationally expensive 3-D simulations to usually less complex two-dimensional (2-D) problems. Systematic errors caused by this simplified model can directly influence the fitting of the model to the measurement data and are expected to become more apparent with decreasing lengths of the structures. We identify these effects using selected simulation results and present experimental setups, e.g., illumination numerical apertures and focal ranges, that can increase the validity of the 2-D approach.

Registration performance on EUV masks using high-resolution registration metrology

NASA Astrophysics Data System (ADS)

Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

2016-10-01

Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements

NASA Astrophysics Data System (ADS)

Mulkens, Jan; Slachter, Bram; Kubis, Michael; Tel, Wim; Hinnen, Paul; Maslow, Mark; Dillen, Harm; Ma, Eric; Chou, Kevin; Liu, Xuedong; Ren, Weiming; Hu, Xuerang; Wang, Fei; Liu, Kevin

2018-03-01

In this paper, we discuss the metrology methods and error budget that describe the edge placement error (EPE). EPE quantifies the pattern fidelity of a device structure made in a multi-patterning scheme. Here the pattern is the result of a sequence of lithography and etching steps, and consequently the contour of the final pattern contains error sources of the different process steps. EPE is computed by combining optical and ebeam metrology data. We show that high NA optical scatterometer can be used to densely measure in device CD and overlay errors. Large field e-beam system enables massive CD metrology which is used to characterize the local CD error. Local CD distribution needs to be characterized beyond 6 sigma, and requires high throughput e-beam system. We present in this paper the first images of a multi-beam e-beam inspection system. We discuss our holistic patterning optimization approach to understand and minimize the EPE of the final pattern. As a use case, we evaluated a 5-nm logic patterning process based on Self-Aligned-QuadruplePatterning (SAQP) using ArF lithography, combined with line cut exposures using EUV lithography.

WaferOptics® mass volume production and reliability

NASA Astrophysics Data System (ADS)

Wolterink, E.; Demeyer, K.

2010-05-01

The Anteryon WaferOptics® Technology platform contains imaging optics designs, materials, metrologies and combined with wafer level based Semicon & MEMS production methods. WaferOptics® first required complete new system engineering. This system closes the loop between application requirement specifications, Anteryon product specification, Monte Carlo Analysis, process windows, process controls and supply reject criteria. Regarding the Anteryon product Integrated Lens Stack (ILS), new design rules, test methods and control systems were assessed, implemented, validated and customer released for mass production. This includes novel reflowable materials, mastering process, replication, bonding, dicing, assembly, metrology, reliability programs and quality assurance systems. Many of Design of Experiments were performed to assess correlations between optical performance parameters and machine settings of all process steps. Lens metrologies such as FFL, BFL, and MTF were adapted for wafer level production and wafer mapping was introduced for yield management. Test methods for screening and validating suitable optical materials were designed. Critical failure modes such as delamination and popcorning were assessed and modeled with FEM. Anteryon successfully managed to integrate the different technologies starting from single prototypes to high yield mass volume production These parallel efforts resulted in a steep yield increase from 30% to over 90% in a 8 months period.

Patterned wafer geometry grouping for improved overlay control

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Park, Junbeom; Song, Changrock; Anis, Fatima; Vukkadala, Pradeep; Jeon, Sanghuck; Choi, DongSub; Huang, Kevin; Heo, Hoyoung; Smith, Mark D.; Robinson, John C.

2017-03-01

Process-induced overlay errors from outside the litho cell have become a significant contributor to the overlay error budget including non-uniform wafer stress. Previous studies have shown the correlation between process-induced stress and overlay and the opportunity for improvement in process control, including the use of patterned wafer geometry (PWG) metrology to reduce stress-induced overlay signatures. Key challenges of volume semiconductor manufacturing are how to improve not only the magnitude of these signatures, but also the wafer to wafer variability. This work involves a novel technique of using PWG metrology to provide improved litho-control by wafer-level grouping based on incoming process induced overlay, relevant for both 3D NAND and DRAM. Examples shown in this study are from 19 nm DRAM manufacturing.

A Precision Metrology System for the Hubble Space Telescope Wide Field Camera 3 Instrument

NASA Technical Reports Server (NTRS)

Toland, Ronald W.

2003-01-01

The Wide Field Camera 3 (WFC3) instrument for the Hubble Space Telescope (HST) will replace the current Wide Field and Planetary Camera 2 (WFPC2). By providing higher throughput and sensitivity than WFPC2, and operating from the near-IR to the near-UV, WFC3 will once again bring the performance of HST above that from ground-based observatories. Crucial to the integration of the WFC3 optical bench is a pair of 2-axis cathetometers used to view targets which cannot be seen by other means when the bench is loaded into its enclosure. The setup and calibration of these cathetometers is described, along with results from a comparison of the cathetometer system with other metrology techniques.

Quantum-enhanced sensing from hyperentanglement

NASA Astrophysics Data System (ADS)

Walborn, S. P.; Pimentel, A. H.; Davidovich, L.; de Matos Filho, R. L.

2018-01-01

Hyperentanglement—simultaneous entanglement between multiple degrees of freedom of two or more systems—has been used to enhance quantum information tasks such as quantum communication and photonic quantum computing. Here we show that hyperentanglement can lead to increased quantum advantage in metrology, with contributions from the entanglement in each degree of freedom, allowing for Heisenberg scaling in the precision of parameter estimation. Our experiment employs photon pairs entangled in polarization and spatial degrees of freedom to estimate a small tilt angle of a mirror. Precision limits beyond shot noise are saturated through a simple binary measurement of the polarization state. The dynamics considered here have broad applicability, implying that similar strategies based on hyperentanglement can offer improvement in a wide variety of physical scenarios and metrological tasks.

Consultative Committee on Ionizing Radiation: Impact on Radionuclide Metrology

PubMed Central

Karam, L.R.; Ratel, G.

2016-01-01

In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM’s consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. PMID:26688351

Vacuum Technology Considerations For Mass Metrology

PubMed Central

Abbott, Patrick J.; Jabour, Zeina J.

2011-01-01

Vacuum weighing of mass artifacts eliminates the necessity of air buoyancy correction and its contribution to the measurement uncertainty. Vacuum weighing is also an important process in the experiments currently underway for the redefinition of the SI mass unit, the kilogram. Creating the optimum vacuum environment for mass metrology requires careful design and selection of construction materials, plumbing components, pumping, and pressure gauging technologies. We review the vacuum technology1 required for mass metrology and suggest procedures and hardware for successful and reproducible operation. PMID:26989593