Science.gov

Sample records for grown nio thin

  1. Chemical and Magnetic Properties of NiO Thin Films Epitaxially Grown on Fe(001)

    NASA Astrophysics Data System (ADS)

    Brambilla, Alberto

    2008-01-01

    Very high quality NiO films have been grown on Fe(001) by means of Molecular Beam Epitaxy. The chemical and magnetic properties of the NiO/Fe(001) interface have been evaluated by means of X-ray Absorption Spectroscopy and X-ray Magnetic Circular Dichroism. Furthermore, combined use of X-ray Magnetic Linear Dichroism and PhotoElectron Emission Microscopy allowed to observe an in-plane uniaxial magnetic anisotropy in very thin NiO films. For NiO films thinner than about 9 atomic layers the NiO magnetic moments align in-plane perpendicular to the Fe substrate magnetization. Above such critical thickness the coupling turns out to be collinear. The effects of thermal treatments, fundamental to produce exchange-biased structures, have also been considered.

  2. Continuous spin reorientation transition in epitaxially grown antiferromagnetic NiO thin films

    SciTech Connect

    Li, J.; Arenholz, E.; Meng, Y.; Tan, A.; Park, J.; Jin, E.; Son, H.; Wu, J.; Jenkins, C. A.; Scholl, A.; Hwang, Chanyong; Qiu, Z. Q.

    2011-03-01

    Fe/NiO/MgO/Ag(001) films were grown epitaxially, and the Fe and NiO spin orientations were determined using x-ray magnetic dichroism. We find that the NiO spins are aligned perpendicularly to the in-plane Fe spins. Analyzing both the in-plane and out-of-plane spin components of the NiO layer, we demonstrate unambiguously that the antiferromagnetic NiO spins undergo a continuous spin reorientation transition from the in-plane to out-of-plane directions with increasing of the MgO thickness.

  3. Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Roffi, Teuku Muhammad; Nozaki, Shinji; Uchida, Kazuo

    2016-10-01

    Nickel oxide (NiO) thin films were grown by atmospheric-pressure metal organic chemical vapor deposition (APMOCVD). Growth was carried out using various growth parameters, including the growth temperature, the input precursor (O2/Ni) ratio, and the type of substrate material. Effects of the growth parameters on the structural and electrical properties of the films were investigated. X-ray diffraction analysis revealed that the crystal structure and quality were strongly affected by the growth temperature and the type of substrate material. At an optimized growth temperature, single-crystalline NiO films were grown on MgO(100) and MgO(111) substrates in a cube-on-cube orientation relationship, while on an Al2O3(001) substrate, the film was grown in the NiO[111] direction. The use of MgO substrates successfully suppressed the formation of twin defects, which have been frequently reported in the growth of NiO. The difference in the formation of the twin defects on MgO and Al2O3 substrates was discussed. It was observed that the resistivity dependence on crystal quality was affected by the choice of substrate material. The effects of the precursor ratio on the transmittance and resistivity of the films were also investigated. Improved transparency in the visible wavelength region and higher conductivity were found in films grown with higher O2/Ni ratios.

  4. Surface electronic structure of polar NiO thin film grown on Ag(111)

    SciTech Connect

    Das, Jayanta; Menon, Krishnakumar S. R.

    2015-06-24

    The growth and structure of NiO thin films on top of Ag(111) substrate were studied where the formation of faceted surface was confirmed by Low Energy Electron Diffraction. The electronic structure of polar NiO(111) surface has been probed using photoemission techniques. The core energy levels and the valence band electronic structure were excited by x-ray and ultraviolet photons respectively. The modifications in physical structure and valence band electronic structure of the film under vacuum annealing have also been enlightened.

  5. Studies on resistive switching times in NiO thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Misra, P.; Sahu, V. K.; Ajimsha, R. S.; Das, A. K.; Singh, B.

    2017-10-01

    The resistive switching dynamics of NiO thin films in Au/NiO/Pt device configuration have been investigated to measure the switching times of set and reset events and their dependence on compliance current and switching voltages. The set switching time was found to be ~10 ns at the set voltage of ~1.8 V, while reset switching time was much longer ~150 µs at reset voltage of 0.8 V. With increasing compliance current from 5 to 75 mA during set process, although the resistance contrast of two states improved due to the decrease in the resistance of the low resistance state, the reset switching time increased substantially up to ~3 ms while set time remained nearly unchanged. The fast reset switching time of ~27 ns, comparable to that of set switching time, was achieved by applying a higher reset voltage of ~1.2 V. The observed dependence of reset time on compliance current and reset voltage in NiO thin films was explained in light of the conducting filamentary model in which reset process is of thermal nature and involves dissolution of conducting filaments as a consequence of Joule heating generated by the reset current.

  6. An analysis of the x-ray linear dichroism spectrum for NiO thin films grown on vicinal Ag(001)

    SciTech Connect

    Wu, Y.Z.; Zhao, Y.; Arenholz, E.; Young, A.T.; Sinkovic, B.; Qiu, Z.Q.

    2008-05-10

    Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L{sub 2} adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L{sub 3} adsorption edge is also measured and analyzed. The result identifies a small energy shift of the L{sub 3} peak. Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering.

  7. Properties of NiO thin films deposited by intermittent spray pyrolysis process

    NASA Astrophysics Data System (ADS)

    Reguig, B. A.; Khelil, A.; Cattin, L.; Morsli, M.; Bernède, J. C.

    2007-02-01

    NiO thin films have been grown on glass substrates by intermittent spray pyrolysis deposition of NiCl 2·6H 2O diluted in distilled water, using a simple "perfume atomizer". The effect of the solution molarity on their properties was studied and compared to those of NiO thin films deposited with a classical spray system. It is shown that NiO thin films crystallized in the NiO structure are achieved after deposition. Whatever the precursor molarity, the grain size is around 25-30 nm. The crystallites are preferentially oriented along the (1 1 1) direction. All the films are p-type. However, the thickness and the conductivity of the NiO films depend on the precursor contraction. By comparison with the properties of films deposited by classical spray technique, it is shown that the critical precursor concentration, which induces strong thin films properties perturbations, is higher when a perfume atomizer is used. This broader stability domain can be attributed to better chlorides decomposition during the rest time used in the perfume atomizer technique.

  8. Electrochromic NiO thin films prepared by spin coating

    NASA Astrophysics Data System (ADS)

    Özütok, F.; Demiri, S.; Özbek, E.

    2017-02-01

    Recently, smart windows are very important because they are often being used in smart buildings and car glasses (windows). At this point, producing effective electrochromic materials is so necessary. In this study, we produced NiO thin films by using spin coating technique on In-doped SnO2 (ITO) substrate. Nickel proportions of these nickel oxide (NiO) films are 3, 5 and 7 %. Nickel acetate tetrahydrate is the initial solution and solvents are ethylene gl ycol and n-hexzane. Structural properties and surface images are investigated by using x-ray diffactometer (XRD) and scanning electron microscope (SEM) device, respectively. In addition, electrochemical behavior is investigated by cyclic voltammetry. A correlation between surface morphology and electrochromic performance was observed as well.

  9. Electrochromism of non-stoichiometric NiO thin film: as single layer and in full device

    NASA Astrophysics Data System (ADS)

    Da Rocha, M.; Rougier, A.

    2016-04-01

    Electrochromic properties, known as a reversible modulation of the optical properties under an applied voltage, of NiO thin films are discussed in respect of the film stoichiometry. Using radio-frequency magnetron sputtering, non-stoichiometric "NiO" thin films of good crystallinity were grown at room temperature from low oxygen partial pressure [i.e., above 2 % P(O2/Ar + O2)]. A further increase in oxygen partial pressure leads to conductive brownish films containing a large amount of Ni3+. 2 %-Ni1- x O thin films exhibit significant EC performance in lithium-based electrolyte with a transmittance modulation of 25 %. If it is generally accepted that this optical modulation is due to an insertion of small cations, the presence of additional surface phenomena is also shown. The cycling of full device, based on the association of WO3 and "NiO" in temperature up to 60 °C and down to -35 °C confirms expected increase and decrease in capacity while surprisingly the optical switch from a transparent to a neutral gray color appears slightly modified.

  10. Evolution of Crystallinity and Texturing on 120 MeV Au Ion Irradiation on NiO Thin Films

    SciTech Connect

    Mallick, P.; Rath, Chandana; Agarwal, D. C.; Avasthi, D. K.; Kanjilal, D.; Biswal, R.; Mishra, N. C.; Behera, D.; Satyam, P. V.

    2008-10-23

    NiO thin films grown on Si(100) substrate by electron beam evaporation and sintered at 500 deg. C and 700 deg. C were irradiated with 120 MeV {sup 197}Au{sup 9+} ions. The FCC structure of the sintered films was retained up to the highest fluence (3 x l0{sup 13} ions.cm{sup -2}) of irradiation. As against the expected amorphization due to ion irradiation when electronic energy loss exceeds certain threshold value, we observe an improvement of crystallinity and grain orientation at certain fluences of irradiation.

  11. Characteristics of Cu-doped amorphous NiO thin films formed by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Sato, Kazuya; Kim, Sangcheol; Komuro, Shuji; Zhao, Xinwei

    2016-06-01

    Transparent conducting Cu-doped NiO thin films were deposited on quartz glass substrates by radio frequency magnetron spattering. The fabricated thin films were all in amorphous phase. A relatively high transmittance of 73% was achieved. The density ratio of Ni3+/(Ni2+ + Ni3+) ions in the films decreased with increasing O2 gas pressure in the fabrication chamber, which caused a decrease in the carrier concentration of the films. The increasing pressure also led to the increase in Hall mobility. By controlling the chamber pressure and substrate temperature, p-type transparent conducting NiO films with reasonable electrical properties were obtained.

  12. Characterization of crystalline structure and morphology of NiO thin films.

    PubMed

    Shin, Hyemin; Choi, Soo-Bin; Yu, Chung-Jong; Kim, Jae-Yong

    2011-05-01

    We investigated the relation of sputtering powers with structural and morphological properties of nickel oxide (NiO) thin films. NiO thin films were fabricated by using an rf-reactive sputtering method on Si(100) substrates with a Ni target in a partial pressure of oxygen and argon. The films were deposited by various rf-sputtering powers from 100 to 200 W at room temperature. The phases and crystalline structures of the deposited films were investigated by using grazing incident X-ray diffraction (XRD). The thickness and surface morphology of the films were investigated by using a field emission-scanning electron microscopy (FE-SEM). The different sputtering conditions drastically affected the crystallinity and the surface morphology of NiO thin films. A combined analysis of the data obtained from X-ray diffraction and SEM images demonstrates that the preferred orientation of NiO films tends to grow from (111) to (200) direction as increasing the sputtering power, which can be explained by in terms of the surface energy along the indexing plane in an fcc structure. As increasing the rf power, lattice constants decreased from 4.26 to 4.20 angstroms and samples became high-quality crystals. Under our experimental condition, NiO films prepared at 150 W with 20% partial pressure of oxygen and 7 cm distance from the sample to the target show the best quality of the crystal.

  13. Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions

    NASA Astrophysics Data System (ADS)

    Cattin, L.; Reguig, B. A.; Khelil, A.; Morsli, M.; Benchouk, K.; Bernède, J. C.

    2008-07-01

    NiO thin films have been deposited by chemical spray pyrolysis using a perfume atomizer to grow the aerosol. The influence of the precursor, nickel chloride hexahydrate (NiCl 2·6H 2O), nickel nitrate hexahydrate (Ni(NO 3) 2·6H 2O), nickel hydroxide hexahydrate (Ni(OH) 2·6H 2O), nickel sulfate tetrahydrate (NiSO 4·4H 2O), on the thin films properties has been studied. In the experimental conditions used (substrate temperature 350 °C, precursor concentration 0.2-0.3 M, etc.), pure NiO thin films crystallized in the cubic phase can be achieved only with NiCl 2 and Ni(NO 3) 2 precursors. These films have been post-annealed at 425 °C for 3 h either in room atmosphere or under vacuum. If all the films are p-type, it is shown that the NiO films conductivity and optical transmittance depend on annealing process. The properties of the NiO thin films annealed under room atmosphere are not significantly modified, which is attributed to the fact that the temperature and the environment of this annealing is not very different from the experimental conditions during spray deposition. The annealing under vacuum is more efficient. This annealing being proceeded in a vacuum no better than 10 -2 Pa, it is supposed that the modifications of the NiO thin film properties, mainly the conductivity and optical transmission, are related to some interaction between residual oxygen and the films.

  14. Magnetic force microscopy of conducting nanodots in NiO thin films

    NASA Astrophysics Data System (ADS)

    Meang, Wan Joo; Seo, Jeongdae; Ahn, Yoonho; Son, J. Y.

    2016-03-01

    We report a nanoscale magnetic conducting filament in a resistive random access memory (RRAM) device by the direct investigation of conducting nanobits in NiO thin films using magnetic force microscopy. The conducting nanobit in a NiO RRAM capacitor formed by CAFM and KFM exhibited a typical bistable resistive switching characteristic. The magnetizations of the conducting nanobit were measured as a function of the set-reset switching cycle and as the switching cycles were increased, a strong ferromagnetic signal was observed. The metallic Ni formation in the nanoscale magnetic conducting filament could be a possible reason for the origin of the magnetism. [Figure not available: see fulltext.

  15. Ferroelectric BaTiO3 thin films on Ni metal tapes using NiO as buffer layer

    NASA Astrophysics Data System (ADS)

    Yuan, Z.; Liu, J.; Weaver, J.; Chen, C. L.; Jiang, J. C.; Lin, B.; Giurgiutiu, V.; Bhalla, A.; Guo, R. Y.

    2007-05-01

    Ferroelectric BaTiO3 (BTO) thin films were deposited on NiO buffered polycrystalline Ni tapes by pulsed laser deposition. Microstructural studies by x-ray diffractometer and transmission electron microscopy reveal that the as-grown BTO films have the nanopillar structures with an average size of approximately 80nm in diameter and the good interface structures with no interdiffusion or reaction. The dielectric and ferroelectric property measurements exhibit that the BTO films have a relatively large dielectric constant, a small dielectric loss, and an extremely large piezoelectric response with a symmetric hysteresis loop. These excellent properties indicate that the as-fabricated BTO films are promising for the development of the structural health monitoring systems.

  16. Kelvin probe force microscopy for conducting nanobits of NiO thin films

    NASA Astrophysics Data System (ADS)

    Son, J. Y.; Shin, Y.-H.; Kim, H.; Cho, J. H.; Jang, H.

    2010-05-01

    We demonstrated the writing and reading of conducting nanobits on a NiO thin film deposited on Pt/TiO2/SiO2/Si substrates for a resistive random access memory (RRAM) application using conducting atomic force microscopy (CAFM) and Kelvin probe force microscopy (KFM). A Pt/NiO/Pt RRAM capacitor showed a typical unipolar switching behavior with bistable resistances. Conducting nanobits with diameters of 22 nm written with a bias of 3.0 V on the NiO thin film were observed with CAFM. The conducting nanobits observed by KFM exhibited negative potentials relative to the insulating regions when there was no bias at the Pt bottom electrode because image charges were induced by charges formed at the end of the KFM tip by the reference AC bias. Enhancement of the KFM signals for conducting nanobits was achieved using specific biases at the Pt bottom electrode, which provided clear KFM images for conducting nanobits.

  17. Kelvin probe force microscopy for conducting nanobits of NiO thin films.

    PubMed

    Son, J Y; Shin, Y-H; Kim, H; Cho, J H; Jang, H

    2010-05-28

    We demonstrated the writing and reading of conducting nanobits on a NiO thin film deposited on Pt/TiO(2)/SiO(2)/Si substrates for a resistive random access memory (RRAM) application using conducting atomic force microscopy (CAFM) and Kelvin probe force microscopy (KFM). A Pt/NiO/Pt RRAM capacitor showed a typical unipolar switching behavior with bistable resistances. Conducting nanobits with diameters of 22 nm written with a bias of 3.0 V on the NiO thin film were observed with CAFM. The conducting nanobits observed by KFM exhibited negative potentials relative to the insulating regions when there was no bias at the Pt bottom electrode because image charges were induced by charges formed at the end of the KFM tip by the reference AC bias. Enhancement of the KFM signals for conducting nanobits was achieved using specific biases at the Pt bottom electrode, which provided clear KFM images for conducting nanobits.

  18. Geometric structures of thin film: Pt on Pd(110) and NiO on Ni(100)

    SciTech Connect

    Warren, Oden L.

    1993-07-01

    This thesis is divided into 3 papers: dynamical low-energy electron- diffraction investigation of lateral displacements in topmost layer of Pd(110); determination of (1x1) and (1x2) structures of Pt thin films on Pd(110) by dynamical low-energy electron-diffraction analysis; and structural determination of a NiO(111) film on Ni(100) by dynamical low-energy electron-diffraction analysis.

  19. Hydrogen Gas Sensing Characteristics of Nanostructured NiO Thin Films Synthesized by SILAR Method

    NASA Astrophysics Data System (ADS)

    Karaduman, Irmak; Çorlu, Tugba; Yıldırım, M. Ali; Ateş, Aytunç; Acar, Selim

    2017-03-01

    Nanostructured NiO thin films have been synthesized by a facile, low-cost successive ionic layer adsorption and reaction (SILAR) method, and the effects of the film thickness on their hydrogen gas sensing properties investigated. The samples were characterized by scanning electron microscopy (SEM), x-ray diffraction (XRD) analysis, and energy-dispersive x-ray analysis. The XRD results revealed that the crystallinity improved with increasing thickness, exhibiting polycrystalline structure. SEM studies showed that all the films covered the glass substrate well. According to optical absorption measurements, the optical bandgap decreased with increasing film thickness. The gas sensing properties of the nanostructured NiO thin films were studied as a function of operating temperature and gas concentration. The samples showed good sensing performance of H2 gas with high response. The maximum response was 75% at operating temperature of 200°C for hydrogen gas concentration of 40 ppm. These results demonstrate that nanostructured NiO thin films synthesized by the SILAR method have potential for application in hydrogen detection.

  20. Structural, optical and photo-catalytic activity of nanocrystalline NiO thin films

    SciTech Connect

    Al-Ghamdi, Attieh A.; Abdel-wahab, M. Sh.; Farghali, A.A.; Hasan, P.M.Z.

    2016-03-15

    Highlights: • Synthesis of nanocrystalline NiO thin films with different thicknesses using DC magnetron sputtering technique. • Effect of film thickness and particle size on photo-catalytic degradation of methyl green dye under UV light was studied. • The deposited NiO thin films are efficient, stable and possess high photo-catalytic activity upon reuse. - Abstract: Physical deposition of nanocrystalline nickel oxide (NiO) thin films with different thickness 30, 50 and 80 nm have been done on glass substrate by DC magnetron sputtering technique and varying the deposition time from 600, 900 to 1200 s. The results of surface morphology and optical characterization of these films obtained using different characterization techniques such as X-ray diffraction (XRD), field emission scanning electron microscope (FESEM), photoluminescence (PL) and UV–vis spectrophotometry provide important information like formation of distinct nanostructures in different films and its effect on their optical band gap which has decreased from 3.74 to 3.37 eV as the film thickness increases. Most importantly these films have shown very high stability and a specialty to be recycled without much loss of their photo-catalytic activity, when tested as photo-catalysts for the degradation of methyl green dye (MG) from the wastewater under the exposure of 18 W energy of UV lamp.

  1. Effect of different nickel precursors on capacitive behavior of electrodeposited NiO thin films

    NASA Astrophysics Data System (ADS)

    Kore, R. M.; Ghadge, T. S.; Ambare, R. C.; Lokhande, B. J.

    2016-04-01

    In the present study, the effect of nickel precursors containing different anions like nitrate, chloride and sulphate on the morphology and pseudocapacitance behavior of NiO is investigated. The NiO samples were prepared by using a potentiondynamic electrodeposition technique in the three electrode cell. Cyclic voltammetry technique was exploited for potentiodynamic deposition of the films. The obtained samples were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), etc. The XRD reveals the cubic crystal structure for all samples. The SEM micrograph shows nanoflakelike, up grown nanoflakes and honeycomb like nanostructured morphologies for nitrate, chloride and sulphate precursors respectively. The capacitive behavior of these samples was recorded using cyclic voltammetry (CV), charge-discharge and electrochemical impedance spectroscopy (EIS) in 1 M KOH electrolyte. The specific capacitance values of NiO samples obtained using CV for nitrate, chloride and sulphate precursors were 136, 214 and 893 Fg-1 respectively, at the scan rate of 5 mVs-1. The charge discharge study shows high specific energy for the sample obtained from sulphate (23.98 Whkg-1) as compared to chloride (9.67 Whkg-1) and nitrate (4.9 Whkg-1), whereas samples of cholride (13.9 kWkg-1 and nitrate (10.5 kWkg-1) shows comparatively more specific power than samples obtained from sulphate (7.6 kWkg-1). The equivalent series resistance of NiO samples observed from EIS study are 1.34, 1.29 and 1.27 Ω respectively for nitrate, chloride and sulphate precursors. These results emphasizes that the samples obtained from sulphate precursors provides very low impedance through honeycomb like nanostructured morphology which supports good capacitive behavior of NiO.

  2. Effect of different nickel precursors on capacitive behavior of electrodeposited NiO thin films

    SciTech Connect

    Kore, R. M.; Ghadge, T. S.; Ambare, R. C.; Lokhande, B. J.

    2016-04-13

    In the present study, the effect of nickel precursors containing different anions like nitrate, chloride and sulphate on the morphology and pseudocapacitance behavior of NiO is investigated. The NiO samples were prepared by using a potentiondynamic electrodeposition technique in the three electrode cell. Cyclic voltammetry technique was exploited for potentiodynamic deposition of the films. The obtained samples were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), etc. The XRD reveals the cubic crystal structure for all samples. The SEM micrograph shows nanoflakelike, up grown nanoflakes and honeycomb like nanostructured morphologies for nitrate, chloride and sulphate precursors respectively. The capacitive behavior of these samples was recorded using cyclic voltammetry (CV), charge-discharge and electrochemical impedance spectroscopy (EIS) in 1 M KOH electrolyte. The specific capacitance values of NiO samples obtained using CV for nitrate, chloride and sulphate precursors were 136, 214 and 893 Fg{sup −1} respectively, at the scan rate of 5 mVs{sup −1}. The charge discharge study shows high specific energy for the sample obtained from sulphate (23.98 Whkg{sup −1}) as compared to chloride (9.67 Whkg{sup −1}) and nitrate (4.9 Whkg{sup −1}), whereas samples of cholride (13.9 kWkg{sup −1} and nitrate (10.5 kWkg{sup −1}) shows comparatively more specific power than samples obtained from sulphate (7.6 kWkg{sup −1}). The equivalent series resistance of NiO samples observed from EIS study are 1.34, 1.29 and 1.27 Ω respectively for nitrate, chloride and sulphate precursors. These results emphasizes that the samples obtained from sulphate precursors provides very low impedance through honeycomb like nanostructured morphology which supports good capacitive behavior of NiO.

  3. Electronic and magnetic structure of epitaxial Fe3O4(001 ) /NiO heterostructures grown on MgO(001) and Nb-doped SrTiO3(001 )

    NASA Astrophysics Data System (ADS)

    Kuepper, K.; Kuschel, O.; Pathé, N.; Schemme, T.; Schmalhorst, J.; Thomas, A.; Arenholz, E.; Gorgoi, M.; Ovsyannikov, R.; Bartkowski, S.; Reiss, G.; Wollschläger, J.

    2016-07-01

    We study the underlying chemical, electronic, and magnetic properties of a number of magnetite-based thin films. The main focus is placed onto Fe3O4 (001)/NiO bilayers grown on MgO(001) and Nb-SrTiO3(001) substrates. We compare the results with those obtained on pure Fe3O4 (001) thin films. It is found that the magnetite layers are oxidized and Fe3 + dominates at the surfaces due to maghemite (γ -Fe2O3 ) formation, which decreases with increasing magnetite layer thickness. For layer thicknesses of around 20 nm and above, the cationic distribution is close to that of stoichiometric Fe3O4 . At the interface between NiO and Fe3O4 we find the Ni to be in a divalent valence state, with unambiguous spectral features in the Ni 2 p core level x-ray photoelectron spectra typical for NiO. The formation of a significant NiFe2O4 interlayer can be excluded by means of x-ray magnetic circular dichroism. Magneto-optical Kerr effect measurements reveal significant higher coercive fields compared to magnetite thin films grown on MgO(001), and an altered in-plane easy axis pointing in the <100 > direction. We discuss the spin magnetic moments of the magnetite layers and find that a thickness of 20 nm or above leads to spin magnetic moments close to that of bulk magnetite.

  4. Structure, optical and electrochromic properties of NiO thin films

    NASA Astrophysics Data System (ADS)

    Sawaby, A.; Selim, M. S.; Marzouk, S. Y.; Mostafa, M. A.; Hosny, A.

    2010-08-01

    Nickel oxide thin films were prepared by sol-gel dip coating process. Nickel acetate tetrahydrate [Ni(CH 3COO) 2·4H 2O] has been used as the starting material with absolute ethyl alcohol to prepare NiO thin films on both glass and indium tin oxide glass (ITO) substrates with heat treatment at different annealing temperatures from 673 to 733 K. Thermogravimetric analysis (TGA) was studied for the xerogel sample. Polycrystalline structures of the prepared films were detected by X-ray diffraction analysis (XRD), and the particle size was determined by Scherrer formula. The morphology and the structure of the prepared thin films were investigated by the transmission electron microscope (TEM). The optical properties of NiO thin films were examined. The optical constants such as the absorption coefficient ( α), extinction coefficient ( k), the energy gap ( Eg) and the refractive index ( n) of the prepared films were determined. The effect of annealing temperature on the electrochromic behavior was observed providing that good electrochromic performance was T<713 K.

  5. Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis

    NASA Astrophysics Data System (ADS)

    Parkhomenko, H. P.; Solovan, M. N.; Mostovoi, A. I.; Orletskii, I. G.; Parfenyuk, O. A.; Maryanchuk, P. D.

    2017-06-01

    Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.

  6. Synthesis and characterization of nickel oxide (NiO) thin films

    NASA Astrophysics Data System (ADS)

    Kate, R. S.; Khalate, S. A.; Deokate, R. J.

    2017-05-01

    Nickel Oxide (NiO) thin films were deposited by simple spray pyrolysis technique using nickel nitrate solution onto preheated glass substrate at substrate temperature 320 °C and 380 °C. Influence of substrate temperature on structural, morphological and optical properties were studied using X-ray diffraction, scanning electron microscopy and optical absorption. XRD results reveal that films are polycrystalline with single phase cubic structure and crystallinity of the film increases as the temperature increases. Surface morphological study shows spherical granular like shape at high deposition temperature. Optical band gap increases from 2.85 to 3.01 eV as the temperature increases.

  7. Thin-walled NiO tubes functionalized with catalytic Pt for highly selective C2H5OH sensors using electrospun fibers as a sacrificial template.

    PubMed

    Cho, Nam Gyu; Woo, Hyung-Sik; Lee, Jong-Heun; Kim, Il-Doo

    2011-10-28

    Hollow thin walled NiO tubes functionalized by catalytic Pt were synthesized via nanofiber templating and multilayered sputter-coating of Pt and NiO thin overlayers followed by heat-treatment at 600 °C. Sandwich Pt-NiO-Pt tube networks exhibited superior C(2)H(5)OH sensing response and remarkable selectivity against CO and H(2) gases.

  8. Influence of discharge voltage on the sensitivity of the resultant sputtered NiO thin films toward hydrogen gas

    NASA Astrophysics Data System (ADS)

    Khalaf, Mohammed K.; Mutlak, Rajaa H.; Khudiar, Ausama I.; Hial, Qahtan G.

    2017-06-01

    Nickel oxide thin films were deposited on glass substrates as the main gas sensor for H2 by the DC sputtering technique at various discharge voltages within the range of 1.8-2.5 kV. Their structural, optical and gas sensing properties were investigated by XRD, AFM, SEM, ultraviolet visible spectroscopy and home-made gas sensing measurement units. A diffraction peak in the direction of NiO (200) was observed for the sputtered films, thereby indicating that these films were polycrystalline in nature. The optical band gap of the films decreased from 3.8 to 3.5 eV when the thickness of the films was increased from 83.5 to 164.4 nm in relation to an increase in the sputtering discharge voltage from 1.8 to 2.5 kV, respectively. The gas sensitivity performance of the NiO films that were formed was studied and the electrical responses of the NiO-based sensors toward different H2 concentrations were also considered. The sensitivity of the gas sensor increased with the working temperature and H2 gas concentration. The thickness of the NiO thin films was also an important parameter in determining the properties of the NiO films as H2 sensors. It was shown in this study that NiO films have the capability to detect H2 concentrations below 3% in wet air, a feature that allows this material to be used directly for the monitoring of the environment.

  9. Effects of oxygen partial pressure and annealing on dispersive optical nonlinearity in NiO thin films

    NASA Astrophysics Data System (ADS)

    Chouhan, Romita; Baraskar, Priyanka; Agrawal, Arpana; Gupta, Mukul; Sen, Pranay K.; Sen, Pratima

    2017-07-01

    We report annealing induced sign reversal of dispersive optical nonlinearity in ion beam sputtered NiO thin films deposited at 30% and 70% oxygen partial pressures. In the Ultraviolet-visible spectra of the samples, the transmission peak corresponding to d-d transitions is observed near 2 eV. A shift in this peak towards higher energy was observed when the same films were annealed at 523 K. The near resonant photoinduced transitions produced giant nonlinear optical susceptibilities of both third- and fifth- orders when the annealed film was irradiated by a continuous wave 632.8 nm He-Ne laser. The role of the thermo-optic effect has been examined critically. Experimental studies further reveal that the oxygen partial pressure influences the growth direction of the grains in the thin films. The well known Z-scan experimental procedure has been followed for measurements of optical nonlinearities in all the NiO films. The nonlinear refractive indices of both the as-deposited and annealed NiO thin films are defined in terms of the thermo-optic coefficients (d/nd T ) T =T0 and (d/2nd T2 ) T =T0 .

  10. Fabrication of NiO thin film electrode for supercapacitor applications

    SciTech Connect

    Mali, V. V.; Navale, S. T.; Chougule, M. A.; Khuspe, G. D.; Godse, P. R.; Patil, V. B.; Pawar, S. A.

    2014-04-24

    Nanocrystalline NiO electrode is successfully electrosynthesized for supercapacitor application. The nanocrystalline NiO electrode is characterized using scanning electron microscope (SEM). Nickel oxide is a highly porous and the film surface looked smooth and composed of fine elongated particles. The supercapacitive performance of NiO electrode is tested using cyclic voltammetry (C-V) technique in 0.5M Na{sub 2}S{sub 2}O{sub 3} electrolyte within potential range of −1.2 to +1.2 V. The effect of scan rate on the capacitance of NiO electrode is studied. The highest specific capacitance of 439 Fg{sup −1} at the voltage scan rate of 50mVs{sup −1} is achieved. Additionally stability and charging–discharging of NiO electrode are studied.

  11. Electrical properties of undoped and Li-doped NiO thin films deposited by RF sputtering without intentional heating

    NASA Astrophysics Data System (ADS)

    Sugiyama, Mutsumi; Nakai, Hiroshi; Sugimoto, Gaku; Yamada, Aika; Chichibu, Shigefusa F.

    2016-08-01

    The fundamental transmittance and electrical properties of undoped and Li-doped NiO thin films deposited by conventional RF sputtering without intentional heating were evaluated. Both the transmittance and resistivity of undoped and Li-doped NiO decreased with increasing O2 fraction in the sputtering gas, f(O2) = O2/(Ar + O2). The result is attributed to the increase in the concentration of acceptors of Ni vacancies (VNi) under oxygen-rich growth conditions. In addition to VNi, Li atom on the Ni site (LiNi) likely acts as a shallow accepter, which can explain the experimental finding that the carrier concentration of Li-doped NiO was approximately three orders of magnitude higher than that of the undoped case deposited under the same f(O2). The mobility of NiO was remarkably low (around 0.1-1.0 cm2 V-1 s-1) and almost independent of f(O2) or the amount of doping, reflecting the large hole effective mass.

  12. EXAFS and XANES investigation of (Li, Ni) codoped ZnO thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Mino, Lorenzo; Gianolio, Diego; Bardelli, Fabrizio; Prestipino, Carmelo; Senthil Kumar, E.; Bellarmine, F.; Ramanjaneyulu, M.; Lamberti, Carlo; Ramachandra Rao, M. S.

    2013-09-01

    Ni doped, Li doped and (Li, Ni) codoped ZnO thin films were successfully grown using a pulsed laser deposition technique. Undoped and doped ZnO thin films were investigated using extended x-ray absorption fine structure (EXAFS) and x-ray absorption near edge spectroscopy (XANES). Preliminary investigations on the Zn K-edge of the undoped and doped ZnO thin films revealed that doping has not influenced the average Zn-Zn bond length and Debye-Waller factor. This shows that both Ni and Li doping do not appreciably affect the average local environment of Zn. All the doped ZnO thin films exhibited more than 50% of substitutional Ni, with a maximum of 77% for 2% Ni and 2% Li doped ZnO thin film. The contribution of Ni metal to the EXAFS signal clearly reveals the presence of Ni clusters. The Ni-Ni distance in the Ni0 nanoclusters, which are formed in the film, is shorter with respect to the reference Ni metal foil and the Debye-Waller factor is higher. Both facts perfectly reflect what is expected for metal nanoparticles. At the highest doping concentration (5%), the presence of Li favors the growth of a secondary NiO phase. Indeed, 2% Ni and 5% Li doped ZnO thin film shows %Nisub = 75 ± 11, %Nimet = 10 ± 8, %NiO = 15 ± 8. XANES studies further confirm that the substitutional Ni is more than 50% in all the samples. These results explain the observed magnetic properties.

  13. Fabrication of hetero-junction diode using NiO thin film on ITO/glass substrate

    NASA Astrophysics Data System (ADS)

    Soni, Sonali; Sharma, Vinay; Kuanr, Bijoy K.

    2016-05-01

    Fabrication, characterization and testing of hetero-junctions of NiO thin films were done. Nickel films were evaporated on polished ITO coated glass substrates using thermal deposition. The films were annealed at high temperatures in the presence of oxygen to obtain NiO films. The rectifying current-voltage (I-V) properties confirmed that a hetero-junction diode was successfully formed. The AC and DC behavior of hetero-junction using DC silver-probes were determined. The threshold voltage, ideality factor and reverse saturation current of hetero junction were determined. We have compared these I-V characteristics with semiconducting PN junction diode. To test the device characteristics, we used the structure as a diode clipper at various frequencies. It is showed that our device is a better high-frequency junction-device than a normal PN junction diode.

  14. Tuning the metal-insulator transition temperature of Sm0.5Nd0.5NiO3 thin films via strain

    NASA Astrophysics Data System (ADS)

    Gardner, H. Jeffrey; Singh, Vijay; Zhang, Le; Hong, Xia

    2014-03-01

    We have investigated the effect of substrate induced strain and film thickness on the metal-insulator transition of the correlated oxide Sm0.5Nd0.5NiO3 (SNNO). We have fabricated epitaxial 3 - 40 nm thick SNNO films on (001) LaAlO3 (LAO), (001) SrTiO3 (STO), and (110) NdGaO3 (NGO) via off-axis RF magnetron sputtering. The SNNO films are atomically smooth with (001) orientation as determined by atomic force microscopy and x-ray diffraction. SNNO films grown on LAO, subject to compressive strain, exhibit a sharp metal-insulator transition at lower temperatures. Conversely, films grown on STO and NGO, subject to tensile strain, exhibit a smeared albeit above room temperature metal-insulator transition. For all substrates, we have observed that the metal-insulator transition temperature (TMI) increases monotonically with decreasing film thickness until the electrically dead layer is reached (below 4 nm). We discuss the effect of strain and oxygen deficiencies on the TMI of SNNO thin films.

  15. Growth and Characteristic of Amorphous Nano-Granular TeO2-V2O5-NiO Thin Films

    NASA Astrophysics Data System (ADS)

    Hosseinzadeh, Sh.; Rahmati, A.; Bidadi, H.

    2016-12-01

    TeO2-V2O5-NiO thin films were deposited using thermal evaporation from 40TeO2-(60-y)V2O5-yNiO (y=0-30mol%) target. Structural analysis of the films was identified by X-ray diffractometry (XRD) and scanning electron microscopy (SEM). The amorphous TeO2-V2O5-NiO films have nanosized clear grain structure and sharp grain boundaries. DC conductivity and current-voltage (I-V) characteristic of TeO2-V2O5-NiO thin films were measured in the temperature range of 300-423K. As nickel oxide (NiO) content increases, the DC conductivity decreases up to two orders in value (10-9-10-11Sṡcm-1). Temperature dependence of conductivity is described using the small polaron hopping (SPH) model as well. Poole-Frenkel effect is observed at high external electric field. The optical absorption spectra of the TeO2-V2O5-NiO thin films were recorded in the wavelength range of 380-1100nm. The absorption coefficient revealed bandgap shrinkage (3.01-2.3eV) and band tail widening, due to an increase in NiO content. Energy dispersive X-ray spectroscopy (EDX) was used to determine elemental composition. In TeO2-V2O5-NiO thin films, the NiO content is around fifth of the initial target.

  16. Metastable oxygen incorporation into thin film NiO by low temperature active oxidation: Influence on hole conduction

    SciTech Connect

    Aydogdu, Gulgun H.; Ruzmetov, Dmitry; Ramanathan, Shriram

    2010-12-01

    The ability to controllably tune cation valence state and resulting electrical conductivity of transition metal-oxides such as NiO is of great interest for a range of solid state electronic and energy devices and more recently in understanding electron correlation phenomena at complex oxide interfaces. Here, we demonstrate that it is possible to enhance electrical conductivity of NiO thin films by one order of magnitude by photoexcitation and three orders of magnitude by ozone treatment at as low as 310 K. The change occurs within nearly 2000 s and, thereafter, reaches a self-limiting value. A surprising difference is seen at 400 K: ultraviolet photon and ozone treatments cause only a marginal reduction in resistance in the first few minutes and, then, the resistance begins to increase and recovers its original value. This unusual reversal is explained by considering metastable incorporation of oxygen in NiO and oxygen equilibration with the environment. Variation in nickel valence state prior to and after photoexcitation and ozone treatment, investigated by x-ray photoelectron spectroscopy, provides mechanistic insights into resistance trends. This study demonstrates photon-assisted and ozone oxidation as effective low temperature routes to tune the electrical properties as well as metastably incorporate oxygen into oxides with direct influence on electrical conduction properties.

  17. Properties of NiO nanostructured growth using thermal dry oxidation of nickel metal thin film for hydrogen gas sensing at room temperature

    NASA Astrophysics Data System (ADS)

    Abubakar, Dauda; Ahmed, Naser M.; Mahmud, Shahrom; Algadri, Natheer A.

    2017-07-01

    A highly qualitative NiO nanostructure was synthesized using thermal dry oxidation of metallic Ni thin films on ITO/glass using the RF sputtering technique. The deposited nickel thin films were oxidized in air ambient at 550 °C inside a furnace. The structural and surface morphologies, and the electrical and gas sensing properties of the NiO nanostructure were examined. An x-ray diffraction analysis demonstrated that the NiO nanostructure has a cubic structure with orientation of the most intense peak at (2 0 0), and shows good crystalline quality. Finite-element scanning electron microscopy and energy dispersive x-ray spectroscopy results revealed O and Ni present in the treated samples, indicating a pure NiO nanostructure composition obtained with high porosity. The electrical properties of the oxidize Ni thin films showed a p-type NiO thin film semiconductor. A hydrogen gas sensing measurement was made at different operating temperatures and different gas concentrations with a detection limit of 30 ppm concentration. The sensor device shows great sensing properties with an excellent sensitivity (310%) at room temperature, which decreases with an increase in the operating temperature. Superfast response and recovery times of 6 and 0.5 s, respectively, were observed with the device at 150 °C operating temperature.

  18. NiO exchange bias layers grown by direct ion beam sputtering of a nickel oxide target

    SciTech Connect

    Michel, R.P.; Chaiken, A.; Johnson, L.E.; Kim, Y.K.

    1996-03-01

    A new process for fabricating NiO exchange bias layers has been developed. The process involves the direct ion beam sputtering (IBS) of a NiO target. The process is simpler than other deposition techniques for producing NiO buffer layers, and facilitates the deposition of an entire spin-valve layered structure using IBS without breaking vacuum. The layer thickness and temperature dependence of the exchange field for NiO/NiFe films produced using IBS are presented and are similar to those reported for similar films deposited using reactive magnetron sputtering. The magnetic properties of highly textured exchange couples deposited on single crystal substrates are compared to those of simultaneously deposited polycrystalline films, and both show comparable exchange fields. These results are compared to current theories describing the exchange coupling at the NiO/NiFe interface.

  19. NiO nanosheets grown on graphene nanosheets as superior anode materials for Li-ion batteries

    NASA Astrophysics Data System (ADS)

    Zou, Yuqin; Wang, Yong

    2011-06-01

    This paper reports a hydrothermal preparation of NiO-graphene sheet-on-sheet and nanoparticle-on-sheet nanostructures. The sheet-on-sheet nanocomposite showed highly reversible large capacities at a common current of 0.1 C and good rate capabilities. A large initial charge capacity of 1056 mAh/g was observed for the sheet-on-sheet composite at 0.1 C, which decreased by only 2.4% to 1031 mAh/g after 40 cycles of discharge and charge. This cycling performance is better than that of NiO nanosheets, graphene nanosheets, NiO-graphene nanoparticle-on-sheet, and previous carbon/carbon nanotube supported NiO composites. It is believed that the mechanical stability and electrical conductivity of NiO nanosheets are increased by graphene nanosheets (GNS), the aggregation or restacking of which to graphite platelets are, on the other hand, effectively prevented by NiO nanosheets.

  20. An ultra-thin, un-doped NiO hole transporting layer of highly efficient (16.4%) organic-inorganic hybrid perovskite solar cells

    NASA Astrophysics Data System (ADS)

    Seo, Seongrok; Park, Ik Jae; Kim, Myungjun; Lee, Seonhee; Bae, Changdeuck; Jung, Hyun Suk; Park, Nam-Gyu; Kim, Jin Young; Shin, Hyunjung

    2016-06-01

    NiO is a wide band gap p-type oxide semiconductor and has potential for applications in solar energy conversion as a hole-transporting layer (HTL). It also has good optical transparency and high chemical stability, and the capability of aligning the band edges to the perovskite (CH3NH3PbI3) layers. Ultra-thin and un-doped NiO films with much less absorption loss were prepared by atomic layer deposition (ALD) with highly precise control over thickness without any pinholes. Thin enough (5-7.5 nm in thickness) NiO films with the thickness of few time the Debye length (LD = 1-2 nm for NiO) show enough conductivities achieved by overlapping space charge regions. The inverted planar perovskite solar cells with NiO films as HTLs exhibited the highest energy conversion efficiency of 16.40% with high open circuit voltage (1.04 V) and fill factor (0.72) with negligible current-voltage hysteresis.NiO is a wide band gap p-type oxide semiconductor and has potential for applications in solar energy conversion as a hole-transporting layer (HTL). It also has good optical transparency and high chemical stability, and the capability of aligning the band edges to the perovskite (CH3NH3PbI3) layers. Ultra-thin and un-doped NiO films with much less absorption loss were prepared by atomic layer deposition (ALD) with highly precise control over thickness without any pinholes. Thin enough (5-7.5 nm in thickness) NiO films with the thickness of few time the Debye length (LD = 1-2 nm for NiO) show enough conductivities achieved by overlapping space charge regions. The inverted planar perovskite solar cells with NiO films as HTLs exhibited the highest energy conversion efficiency of 16.40% with high open circuit voltage (1.04 V) and fill factor (0.72) with negligible current-voltage hysteresis. Electronic supplementary information (ESI) available. See DOI: 10.1039/c6nr01601d

  1. Effects of anode materials on resistive characteristics of NiO thin films

    SciTech Connect

    Jia, Ze; Wang, Linkai; Zhang, Naiwen; Ren, Tianling; Liou, Juin J.

    2013-01-28

    This letter shows that the NiO-based structure with different anodes has different resistive switching properties. A conical conductive filament (CF) model is proposed for oxygen vacancies distributed in NiO films. Modeling analysis reveals much larger dissolution velocity of CF near anodes than near cathodes during the reset process. Different interfaces shown in Auger electron spectroscopy can be bound with the model to reveal that CF is dissolved in the structure with Pt or Au as anodes, while CF remains constant if the anode material is Ti or Al, which can explain whether switching properties occur in the specific NiO-based structures.

  2. Surface-phonon dispersion of a NiO(100) thin film

    NASA Astrophysics Data System (ADS)

    Kostov, K. L.; Polzin, S.; Saha, S. K.; Brovko, O.; Stepanyuk, V.; Widdra, W.

    2013-06-01

    A well-ordered 25 ML epitaxial NiO(100) film on Ag(100) as prepared by layer-by-layer growth has been characterized by high-resolution electron energy loss spectroscopy. Six different phonon branches have been identified in the Γ¯X¯ direction of the surface Brillouin zone and are compared with first-principles phonon calculations. Whereas the surface Rayleigh mode shows a strong upward dispersion of 173 cm-1 in agreement with observations for the NiO(100) single crystal, the other surface phonons and surface resonances show only smaller dispersion widths in Γ¯X¯ direction. The Wallis and the Lucas phonons are localized at 425 and 367 cm-1 at the Γ¯ point, respectively. Additionally, two phonons are identified that have stronger weight at the zone boundary at 194 and 285 cm-1 and that become surface resonances at the zone center. The dominant spectral feature is the Fuchs-Kliewer (FK) phonon polariton at 559 cm-1, which is excited by dipole scattering and exhibits a rather broad non-Lorentzian lineshape. The lineshape is explained by a FK splitting resulting from the splitting of bulk optical phonons due to antiferromagnetic order. This view is supported by calculations of the surface-loss function from bulk reflectivity data.

  3. Multiferroic YCrO3 thin films grown on glass substrate: Resistive switching characteristics

    NASA Astrophysics Data System (ADS)

    Seo, Jeongdae; Ahn, Yoonho; Son, Jong Yeog

    2016-01-01

    Polycrystalline YCrO3 thin films were deposited on (111) Pt/Ta/glass substrates by pulsed laser deposition. The YCrO3 thin films exhibited good ferroelectric properties with remnant polarization of about 5 µC/cm2. Large leakage current was observed by I- V curve and ferroelectric hysteresis loop. The YCrO3 resistive random access memory (RRAM) capacitor showed unipolar switching behaviors with SET and RESET voltages higher than those of general NiO RRAM capacitors. [Figure not available: see fulltext.

  4. Layer matching epitaxy of NiO thin films on atomically stepped sapphire (0001) substrates

    PubMed Central

    Yamauchi, Ryosuke; Hamasaki, Yosuke; Shibuya, Takuto; Saito, Akira; Tsuchimine, Nobuo; Koyama, Koji; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Thin-film epitaxy is critical for investigating the original properties of materials. To obtain epitaxial films, careful consideration of the external conditions, i.e. single-crystal substrate, temperature, deposition pressure and fabrication method, is significantly important. In particular, selection of the single-crystal substrate is the first step towards fabrication of a high-quality film. Sapphire (single-crystalline α-Al2O3) is commonly used in industry as a thin-film crystal-growth substrate, and functional thin-film materials deposited on sapphire substrates have found industrial applications. However, while sapphire is a single crystal, two types of atomic planes exist in accordance with step height. Here we discuss the need to consider the lattice mismatch for each of the sapphire atomic layers. Furthermore, through cross-sectional transmission electron microscopy analysis, we demonstrate the uniepitaxial growth of cubic crystalline thin films on bistepped sapphire (0001) substrates. PMID:26402241

  5. Layer matching epitaxy of NiO thin films on atomically stepped sapphire (0001) substrates

    NASA Astrophysics Data System (ADS)

    Yamauchi, Ryosuke; Hamasaki, Yosuke; Shibuya, Takuto; Saito, Akira; Tsuchimine, Nobuo; Koyama, Koji; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-09-01

    Thin-film epitaxy is critical for investigating the original properties of materials. To obtain epitaxial films, careful consideration of the external conditions, i.e. single-crystal substrate, temperature, deposition pressure and fabrication method, is significantly important. In particular, selection of the single-crystal substrate is the first step towards fabrication of a high-quality film. Sapphire (single-crystalline α-Al2O3) is commonly used in industry as a thin-film crystal-growth substrate, and functional thin-film materials deposited on sapphire substrates have found industrial applications. However, while sapphire is a single crystal, two types of atomic planes exist in accordance with step height. Here we discuss the need to consider the lattice mismatch for each of the sapphire atomic layers. Furthermore, through cross-sectional transmission electron microscopy analysis, we demonstrate the uniepitaxial growth of cubic crystalline thin films on bistepped sapphire (0001) substrates.

  6. Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Wang, Hui; Zhao, Yang; Li, Xinzhong; Zhen, Zhiqiang; Li, Hehe; Wang, Jingge; Tang, Miaomiao

    2017-07-01

    NiO thin films were deposited on sapphire and Corning 1737 glass substrates using the radio frequency magnetron sputtering system. The structures, optical and electrical properties of NiO films grown under different sputtering temperatures were thoroughly studied. The NiO films were composed of different-size NiO nano-grains with a strong (111) preferred orientation. The NiO grain size increased with the sputtering temperature increase. The band gap values decreased from 3.69 eV to 3.38 eV on the sputtering temperature increase from 30°C to 450°C. Moreover, the electrical property variations of the NiO samples were studied by the Hall effect in detail.

  7. Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Wang, Hui; Zhao, Yang; Li, Xinzhong; Zhen, Zhiqiang; Li, Hehe; Wang, Jingge; Tang, Miaomiao

    2017-03-01

    NiO thin films were deposited on sapphire and Corning 1737 glass substrates using the radio frequency magnetron sputtering system. The structures, optical and electrical properties of NiO films grown under different sputtering temperatures were thoroughly studied. The NiO films were composed of different-size NiO nano-grains with a strong (111) preferred orientation. The NiO grain size increased with the sputtering temperature increase. The band gap values decreased from 3.69 eV to 3.38 eV on the sputtering temperature increase from 30°C to 450°C. Moreover, the electrical property variations of the NiO samples were studied by the Hall effect in detail.

  8. Structural, optical and ac electrical characterization of CBD synthesized NiO thin films: Influence of thickness

    NASA Astrophysics Data System (ADS)

    Das, M. R.; Mukherjee, A.; Mitra, P.

    2017-09-01

    We have studied the electrical conductivity, dielectric relaxation mechanism and impedance spectroscopy characteristics of nickel oxide (NiO) thin films synthesized by chemical bath deposition (CBD) method. Thickness dependent structural, optical and ac electrical characterization has been carried out and deposition time was varied to control the thickness. The material has been characterized using X-ray diffraction and UV-VIS spectrophotometer. Impedance spectroscopy analysis confirmed enhancement of ac conductivity and dielectric constant for films deposited with higher deposition time. Decrease of grain size in thicker films were confirmed from XRD analysis and activation energy of the material for electrical charge hopping process was increased with thickness of the film. Decrease in band gap in thicker films were observed which could be associated with creation of additional energy levels in the band gap of the material. Cole-Cole plot shows contribution of both grain and grain boundary towards total resistance and capacitance. The overall resistance was found to decrease from 14.6 × 105 Ω for 30 min deposited film ( 120 nm thick) to 2.42 × 105 Ω for 120 min deposited film ( 307 nm thick). Activation energy value to electrical conduction process evaluated from conductivity data was found to decrease with thickness. Identical result was obtained from relaxation time approach suggesting hopping mechanism of charge carriers.

  9. Cu(In, Ga)Se2 thin film solar cells grown at low temperatures

    NASA Astrophysics Data System (ADS)

    Zhang, W.; Zhu, H.; Zhang, L.; Guo, Y.; Niu, X.; Li, Z.; Chen, J.; Liu, Q.; Mai, Y.

    2017-06-01

    Cu(In, Ga)Se2 (CIGS) thin film solar cells were grown on polyimide (PI) and soda lime glass (SLG) substrates at low substrate temperatures between 400 °C and 500 °C. Different material properties of the CIGS thin films and photovoltaic performances of the solar cells were systematically investigated. It is found that the (112), (220)/(204) and (116)/(312) peaks from X-ray diffraction (XRD) patterns show double-peak patterns as the substrate temperature decreases. The CIGS thin films grown on both PI and SLG substrates shows layered structures. The bottom and surficial layers of CIGS thin films display small size polycrystalline grains while the middle layers show large size polycrystalline grains. Both types of CIGS thin film solar cells exhibit similar efficiencies while CIGS thin film solar cells grown on PI substrates show lower open circuit voltage and fill factor but higher short circuit current density, as compared to those of CIGS thin film solar cells on SLG substrates. The highest efficiency of 6.14% has been achieved for the CIGS thin film solar cells on PI with the structure of PI/Mo/CIGS/CdS/i-ZnO/ZnO:Al/Al grid here.

  10. Controlled p-type to n-type conductivity transformation in NiO thin films by ultraviolet-laser irradiation

    SciTech Connect

    Gupta, Pranav; Dutta, Titas; Mal, Siddhartha; Narayan, Jagdish

    2012-01-01

    We report the systematic changes in structural, electrical, and optical properties of NiO thin films on c-sapphire introduced by nanosecond ultraviolet excimer laser pulses. Epitaxial nature of as deposited NiO was determined by x-ray diffraction phi scans and transmission electron microscopy (TEM) and it was established that NiO film growth takes place with twin domains on sapphire where two types of domains have 60 deg. in-plane rotation with respect to each other about the [111] growth direction. We determined that at pulsed laser energy density of 0.275 J/cm{sup 2}, NiO films exhibited conversion from p-type semiconducting to n-type conductive behavior with three orders of magnitude decrease in resistivity, while maintaining its cubic crystal structure and good epitaxial relationship. Our TEM and electron-energy-loss spectroscopy studies conclusively ruled out the presence of any Ni clustering or precipitation due to the laser treatment. The laser-induced n-type carrier transport and conductivity enhancement were shown to be reversible through subsequent thermal annealing in oxygen. This change in conductivity behavior was correlated with the nonequilibrium concentration of laser induced Ni{sup 0}-like defect states.

  11. Lightweight sodium alanate thin films grown by reactive sputtering

    SciTech Connect

    Filippi, M.; Rector, J. H.; Gremaud, R.; Setten, M. J. van; Dam, B.

    2009-09-21

    We report the preparation of sodium alanate, a promising hydrogen storage material, in a thin film form using cosputtering in a reactive atmosphere of atomic hydrogen. We study the phase formation and distribution, and the hydrogen desorption, with a combination of optical and infrared transmission spectroscopy. We show that the hydrogen desorption, the phase segregation, and the role of the dopants in these complex metal hydrides can be monitored with optical measurements. This result shows that a thin film approach can be used for a model study of technologically relevant lightweight metal hydrides.

  12. Structural and morphological properties of sputtered NiO thin films at various sputtering pressures

    SciTech Connect

    Reddy, A. Mallikarjuna; Reddy, Y. Ashok Kumar; Reddy, A. Sivasankar; Reddy, P. Sreedhara

    2012-06-05

    Nickel oxide thin films were successfully deposited on glass substrates at different sputtering pressures in the range of 3 x 10{sup -2} to 5 x 10{sup -2} mbar. It was observed that sputtering pressure influenced the structural and morphological properties. Structural properties were studied with X-ray diffractometer. All the deposited films were polycrystalline and exhibited cubic structure with preferential growth along (220) plane. From morphological studies it was observed that fine and uniform grains with RMS roughness of 9.4 nm were obtained when the films deposited at a sputtering pressure of 4 x 10{sup -2} mbar,. The grain size and the surface roughness decreased at higher sputtering pressures. The surface mobility of the adatoms decreased after series of collisions resulting in the decrease of grain size at high sputtering pressures.

  13. Creatinine biomaterial thin films grown by laser techniques.

    PubMed

    György, E; Axente, E; Mihailescu, I N; Predoi, D; Ciuca, S; Neamtu, J

    2008-03-01

    Creatinine thin films were synthesised by matrix assisted pulsed laser deposition (PLD) techniques for enzyme-based biosensor applications. An UV KrF* (lambda=248 nm, tau approximately 10 ns) excimer laser source was used for the irradiation of the targets at incident fluence values in the 0.3-0.5 J/cm2 range. For the matrix assisted PLD the targets consisted on a frozen composite obtained by dissolving the biomaterials in distilled water. The surface morphology, chemical composition and structure of the obtained biomaterial thin films were investigated by scanning electron microscopy, Fourier transform infrared spectroscopy, and electron dispersive X-ray spectroscopy as a function of the target preparation procedure and incident laser fluence.

  14. Polymer thin films embedded with in situ grown metal nanoparticles.

    PubMed

    Ramesh, G V; Porel, S; Radhakrishnan, T P

    2009-09-01

    Metal nanoparticle-polymer composites are versatile materials which not only combine the unique characteristics of the components, but also manifest mutualistic effects between the two. Embedding inside polymer thin films facilitates immobilization and organization of the metal nanoparticles and tuning of their electronic and optical responses by the dielectric environment. The embedded metal nanoparticles in turn can impact upon the various material attributes of the polymer matrix. Some of the most convenient and attractive routes to the fabrication of metal nanoparticle-embedded polymer thin films involve in situ generation of the nanoparticles through reduction or decomposition of appropriate precursors inside the solid film. In this tutorial review we present an overview of the different methodologies developed using this general concept and describe the environment-friendly protocol we have optimized for the fabrication of noble metal nanostructures inside polymer thin films, using aqueous media for the synthesis and deploying the polymer itself as the reducing as well as stabilizing agent. A variety of techniques that have been exploited to characterize the precursor to product transformation inside the polymer film are discussed. The unique control provided by the in situ fabrication route on the size, shape and distribution of the nanostructures, and application of the polymer thin films with the in situ generated metal nanoparticles in areas such as nonlinear optics, surface enhanced Raman scattering, e-beam lithography, microwave absorption, non-volatile memory devices and random lasers, illustrate the versatility of these materials. A brief appraisal of the avenues for future developments in this area is presented.

  15. Effect of annealing on the optical properties of the ion beam sputtered NiO thin film

    NASA Astrophysics Data System (ADS)

    Chouhan, Romita; Baraskar, Priyanka; Dar, Tanveer A.; Agrawal, Arpana; Gupta, Mukul; Sen, Pranay K.; Sen, Pratima.

    2017-05-01

    Effect of annealing on optical characteristics of Nickel oxide thin films deposited by ion beam sputtering technique from a Ni target in a mixture of oxygen and argon gas on to a glass substrate has been studied. The deposited films were characterized in as deposited state(S1) and after annealing(S2) at temp of 523 K. Crystalline properties of films were investigated using X-ray diffraction technique from which we found that both S1 and S2 shows the polycrystalline nature with preferential growth along (111) plane. The transmittance of the S2 films was decreased. The surface morphology of the film was studied using atomic force microscopy (AFM). The nonlinear optical properties of the films were obtained using z-scan technique which reveals that the nonlinear absorption coefficient of S2 films is larger than that of S1 samples. Improved nonlinearity suggests the utility of the grown films for optoelectronic device application.

  16. PbTe thin films grown by femtosecond pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Rodriguez, E.; Silva, D.; Moya, L.; Cesar, C. L.; Barbosa, L. C.; Schrank, A.; Souza Filho, C. R.; de Oliveira, E. P.

    2007-09-01

    PbTe thin films were grown on BK7 glass and Si(100) substrates using femtosecond pulsed laser deposition at room temperature. The influence of the background pressure and the laser fluence on the structural and optical characteristics of the PbTe films was studied. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) were used to characterize the surface and structural properties of the deposited PbTe thin films, respectively. Transmission spectroscopy measurements in the visible and infrared region (VIS-IR) were used to investigate the optical properties of the PbTe thin films.

  17. Some studies on successive ionic layer adsorption and reaction (SILAR) grown indium sulphide thin films

    SciTech Connect

    Pathan, H.M.; Lokhande, C.D. . E-mail: l_chandrakant@yahoo.com; Kulkarni, S.S.; Amalnerkar, D.P.; Seth, T.; Han, Sung-Hwan . E-mail: shhan@hanyang.ac.kr

    2005-06-15

    Indium sulphide (In{sub 2}S{sub 3}) thin films were grown on amorphous glass substrate by the successive ionic layer adsorption and reaction (SILAR) method. X-ray diffraction, optical absorption, scanning electron microscopy (SEM) and Rutherford back scattering (RBS) were applied to study the structural, optical, surface morphological and compositional properties of the indium sulphide thin films. Utilization of triethanolamine and hydrazine hydrate complexed indium sulphate and sodium sulphide as precursors resulted in nanocrystalline In{sub 2}S{sub 3} thin film. The optical band gap was found to be 2.7 eV. The film appeared to be smooth and homogeneous from SEM study.

  18. BiVO4 thin film photoanodes grown by chemical vapor deposition.

    PubMed

    Alarcón-Lladó, Esther; Chen, Le; Hettick, Mark; Mashouf, Neeka; Lin, Yongjing; Javey, Ali; Ager, Joel W

    2014-01-28

    BiVO4 thin film photoanodes were grown by vapor transport chemical deposition on FTO/glass substrates. By controlling the flow rate, the temperatures of the Bi and V sources (Bi metal and V2O5 powder, respectively), and the temperature of the deposition zone in a two-zone furnace, single-phase monoclinic BiVO4 thin films can be obtained. The CVD-grown films produce global AM1.5 photocurrent densities up to 1 mA cm(-2) in aqueous conditions in the presence of a sacrificial reagent. Front illuminated photocatalytic performance can be improved by inserting either a SnO2 hole blocking layer and/or a thin, extrinsically Mo doped BiVO4 layer between the FTO and the CVD-grown layer. The incident photon to current efficiency (IPCE), measured under front illumination, for BiVO4 grown directly on FTO/glass is about 10% for wavelengths below 450 nm at a bias of +0.6 V vs. Ag/AgCl. For BiVO4 grown on a 40 nm SnO2/20 nm Mo-doped BiVO4 back contact, the IPCE is increased to over 40% at wavelengths below 420 nm.

  19. Thin YBCO films on ? (001) substrates grown by injection MOCVD

    NASA Astrophysics Data System (ADS)

    Abrutis, A.; Sénateur, J. P.; Weiss, F.; Kubilius, V.; Bigelyte, V.; Saltyte, Z.; Vengalis, B.; Jukna, A.

    1997-12-01

    YBCO thin (about 0953-2048/10/12/021/img10) films were deposited at 0953-2048/10/12/021/img11 on 0953-2048/10/12/021/img12 (001) by single-source injection CVD. Precisely controlled microamounts of organometallic 0953-2048/10/12/021/img13-diketonates dissolved in an organic solvent were injected sequentially into the evaporator by means of a computer-driven injector and the resultant vapour was transported into the deposition zone. The influence of the vapour phase composition on films' properties was investigated. A mixture of 0953-2048/10/12/021/img14 and 0953-2048/10/12/021/img15-oriented YBCO crystallites exists in all deposited films and its ratio depends on the vapour phase composition. For both a and c perpendicular crystallites only 0953-2048/10/12/021/img16 in-plane orientation with respect to substrate axes was found. Bidirectional twinning was established in the crystallites of both types. 0953-2048/10/12/021/img17 of the films (about 90 K) was almost independent of the vapour phase composition in the studied range. However, the critical current density 0953-2048/10/12/021/img18 depended clearly on the vapour phase composition in relation to the 0953-2048/10/12/021/img19 ratio variation. 0953-2048/10/12/021/img18 of the films varied in the range 0953-2048/10/12/021/img21.

  20. Polarity and microstructure in InN thin layers grown by MOVPE

    NASA Astrophysics Data System (ADS)

    Kuwano, N.; Nakahara, Y.; Amano, H.

    2006-06-01

    Microstructures in InN grown on sapphire (0001) and yttria-stabilized zirconia (YSZ) (111) by metal-organic vapor phase epitaxy (MOVPE) were analyzed by means of transmission electron microscopy (TEM) in order to clarify the growth process. Special attention was paid to the selectivity of the crystal polarity of InN. The InN thin films grown on sapphire after nitridation has a flat surface while those grown on YSZ has hillocks on the surface. The crystal polarity was determined by comparing the experimentally observed intensity distribution in convergent beam electron diffraction (CBED) disks with those simulated by the Broch-wave method. It was found that the InN grown on the sapphire has a nitrogen-polarity and the one on YSZ has a mixture of In- and N-polarities. The effect of surface-nitridation of sapphire on the growth process is also discussed

  1. Effect of NiO spin orientation on the magnetic anisotropy of the Fe film in epitaxially grown Fe/NiO/Ag(001) and Fe/NiO/MgO(001)

    SciTech Connect

    Kim, W.; Jin, E.; Wu, J.; Park, J.; Arenholz, E.; Scholl, A.; Hwang, C.; Qiu, Z.

    2010-02-10

    Single crystalline Fe/NiO bilayers were epitaxially grown on Ag(001) and on MgO(001), and investigated by Low Energy Electron Diffraction (LEED), Magneto-Optic Kerr Effect (MOKE), and X-ray Magnetic Linear Dichroism (XMLD). We find that while the Fe film has an in-plane magnetization in both Fe/NiO/Ag(001) and Fe/NiO/MgO(001) systems, the NiO spin orientation changes from in-plane direction in Fe/NiO/Ag(001) to out-of-plane direction in Fe/NiO/MgO(001). These two different NiO spin orientations generate remarkable different effects that the NiO induced magnetic anisotropy in the Fe film is much greater in Fe/NiO/Ag(001) than in Fe/NiO/MgO(001). XMLD measurement shows that the much greater magnetic anisotropy in Fe/NiO/Ag(001) is due to a 90{sup o}-coupling between the in-plane NiO spins and the in-plane Fe spins.

  2. Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Shih, Huan-Yu; Lin, Ming-Chih; Chen, Liang-Yih; Chen, Miin-Jang

    2015-01-01

    The growth of uniform gallium nitride (GaN) thin films was reported on (100) Si substrate by remote plasma atomic layer deposition (RP-ALD) using triethylgallium (TEG) and NH3 as the precursors. The self-limiting growth of GaN was manifested by the saturation of the deposition rate with the doses of TEG and NH3. The increase in the growth temperature leads to the rise of nitrogen content and improved crystallinity of GaN thin films, from amorphous at a low deposition temperature of 200 °C to polycrystalline hexagonal structures at a high growth temperature of 500 °C. No melting-back etching was observed at the GaN/Si interface. The excellent uniformity and almost atomic flat surface of the GaN thin films also infer the surface control mode of the GaN thin films grown by the RP-ALD technique. The GaN thin films grown by RP-ALD will be further applied in the light-emitting diodes and high electron mobility transistors on (100) Si substrate.

  3. Nanocrystalline-CdS thin films grown on flexible PET-substrates by chemical bath deposition

    NASA Astrophysics Data System (ADS)

    Rodríguez-Rosales, K.; Quiñones-Galván, J. G.; Guillén-Cervantes, A.; Campos-González, E.; Santos-Cruz, J.; Mayén-Hernández, S. A.; Arias-Cerón, J. S.; Olvera, M. de la L.; Zelaya-Angel, O.; Hernández-Hernández, L. A.; Contreras-Puente, G.; de Moure-Flores, F.

    2017-07-01

    CdS thin films were grown on flexible PET and PET/ITO substrates by chemical bath deposition varying the deposition time. The structural analysis indicates that CdS films are composed of nano-crystalline and amorphous material. CdS films grown on PET substrates have hexagonal phase, while those grown on PET/ITO substrates have a cubic phase. The bandgap values of CdS films grown on PET substrates are in the range 2.31-2.45 eV, and the E g of CdS films grown on PET/ITO substrates are 2.18-2.42 eV. A strong green photoluminescence emission was observed in all the samples, which is associated to near band edge transitions. CdS films grown on PET/ITO substrates have an additional emission at 2.80 eV, which can be attributed to the presence of nano-crystals, in agreement with TEM analyses.

  4. Inverted fractal analysis of TiOx thin layers grown by inverse pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Égerházi, L.; Smausz, T.; Bari, F.

    2013-08-01

    Inverted fractal analysis (IFA), a method developed for fractal analysis of scanning electron microscopy images of cauliflower-like thin films is presented through the example of layers grown by inverse pulsed laser deposition (IPLD). IFA uses the integrated fractal analysis module (FracLac) of the image processing software ImageJ, and an objective thresholding routine that preserves the characteristic features of the images, independently of their brightness and contrast. IFA revealed fD = 1.83 ± 0.01 for TiOx layers grown at 5-50 Pa background pressures. For a series of images, this result was verified by evaluating the scaling of the number of still resolved features on the film, counted manually. The value of fD not only confirms the fractal structure of TiOx IPLD thin films, but also suggests that the aggregation of plasma species in the gas atmosphere may have only limited contribution to the deposition.

  5. Flexible cadmium telluride thin films grown on electron-beam-irradiated graphene/thin glass substrates

    SciTech Connect

    Seo, Won-Oh; Kim, Jihyun; Koo, Yong Hwan; Kim, Byungnam; Lee, Byung Cheol; Kim, Donghwan

    2014-08-25

    We demonstrate the close-spaced sublimation growth of polycrystalline cadmium telluride (CdTe) thin films on a flexible graphene electrode/thin glass substrate structure. Prior to the growth of CdTe films, chemical-vapor-deposited graphene was transferred onto a flexible glass substrate and subjected to electron-beam irradiation at an energy of 0.2 MeV in order to intentionally introduce the defects into it in a controlled manner. Micro-Raman spectroscopy and sheet resistance measurements were employed to monitor the damage and disorder in the electron-beam irradiated graphene layers. The morphology and optical properties of the CdTe thin films deposited on a graphene/flexible glass substrate were systematically characterized. The integration of the defective graphene layers with a flexible glass substrate can be a useful platform to grow various thin-film structures for flexible electronic and optoelectronic devices.

  6. Y1Ba2Cu3O7-δ thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Takano, Satoshi; Hayashi, Noriki; Okuda, Shigeru; Hitosuyanagi, Hajime

    1989-12-01

    Y1Ba2Cu3O7-δ thin films were grown on (100)MgO and polycrystalline YSZ substrates by RF magnetron sputtering. We measured the magnetic field dependence of Jc of these films. The films grown on MgO with Jc of 4.0x106, 2.9 x106 and 1.5x104 A/cm2 at OT showed 7.1x105 A/cm2 at 8T, 1x104 A/cm2 at 20T and 1.1x103 A/cm2 at 5 T, respectively . We could attain a c-axis oriented film with a Jc of 1.2x104 A/cm2 on YSZ polycrystalline substrate, however, it showed greater degradation than the films grown on MgO in Jc with magnetic field.

  7. Y 1Ba 2Cu 3O 7-δ thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Takano, Satoshi; Hayashi, Noriki; Okuda, Shigeru; Hitosuyanagi, Hajime

    1989-12-01

    Y 1Ba 2Cu 3O 7-δ thin films were grown on (100)MgO and polycrystalline YSZ substrates by RF magnetron sputtering. We measured the magnetic field dependence of Jc of these films. The films grown on MgO with Jc of 4.0x10 6, 2.9 x10 6 and 1.5x10 4 A/cm 2 at OT showed 7.1x10 5 A/cm 2 at 8T, 1x10 4 A/cm 2 at 20T and 1.1x10 3 A/cm 2 at 5 T, respectively . We could attain a c-axis oriented film with a Jc of 1.2x10 4 A/cm 2 on YSZ polycrystalline substrate, however, it showed greater degradation than the films grown on MgO in Jc with magnetic field.

  8. Enhanced performance of room-temperature-grown epitaxial thin films of vanadium dioxide

    SciTech Connect

    Nag, Joyeeta; Payzant, E Andrew; More, Karren Leslie; HaglundJr., Richard F

    2011-01-01

    Stoichiometric vanadium dioxide in bulk, thin film and nanostructured forms exhibits an insulator-to-metal transition (IMT) accompanied by a structural phase transformation, induced by temperature, light, electric fields, doping or strain. We have grown epitaxial films of vanadium dioxide on c-plane (0001) of sapphire using two different procedures involving (1) room temperature growth followed by annealing and (2) direct high temperature growth. Strain at the film-substrate interface due to growth at different temperatures leads to interesting differences in morphologies and phase transition characteristics. Comparison of the morphologies and switching characteristics of the two films shows that contrary to conventional wisdom, the room-temperature grown films have smoother, more continuous morphologies and better switching performance, consistent with the behavior of epitaxially grown semiconductors.

  9. Thin film phase diagram of iron nitrides grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Gölden, D.; Hildebrandt, E.; Alff, L.

    2017-01-01

    A low-temperature thin film phase diagram of the iron nitride system is established for the case of thin films grown by molecular beam epitaxy and nitrided by a nitrogen radical source. A fine-tuning of the nitridation conditions allows for growth of α ‧ -Fe8Nx with increasing c / a -ratio and magnetic anisotropy with increasing x until almost phase pure α ‧ -Fe8N1 thin films are obtained. A further increase of nitrogen content below the phase decomposition temperature of α ‧ -Fe8N (180 °C) leads to a mixture of several phases that is also affected by the choice of substrate material and symmetry. At higher temperatures (350 °C), phase pure γ ‧ -Fe4N is the most stable phase.

  10. Structural and optical properties of PbS thin films grown by chemical bath deposition

    SciTech Connect

    Seghaier, S.; Kamoun, N.; Guasch, C.; Zellama, K.

    2007-09-19

    Lead sulphide thin films are grown on glass substrates at various deposition times tD, in the range of 40-60 min per step of 2 min, using the chemical bath deposition technique. X-ray diffraction and atomic force microscopy are used to characterize the film structure. The surface composition is analysed by Auger electron spectroscopy. It appears that the as-prepared thin films are polycrystalline with cubic structure. Nanometric scale crystallites are uniformly distributed on the surface. They exhibit almost a stoechiometric composition with a [Pb]/[S] ratio equal to 1.10. Optical properties are studied in the range of 300-3300 nm by spectrophotometric measurements. Analysis of the optical absorption data of lead sulphide thin layers reveals a narrow optical direct band gap equal to 0.46 eV for the layer corresponding to a deposition time equal to 60 min.

  11. Amorphous indium gallium zinc oxide thin film grown by pulse laser deposition technique

    SciTech Connect

    Mistry, Bhaumik V. Joshi, U. S.

    2016-05-23

    Highly electrically conducting and transparent in visible light IGZO thin film were grown on glass substrate at substrate temperature of 400 C by a pulse laser deposition techniques. Structural, surface, electrical, and optical properties of IGZO thin films were investigated at room temperature. Smooth surface morphology and amorphous nature of the film has been confirmed from the AFM and GIXRD analysis. A resistivity down to 7.7×10{sup −3} V cm was reproducibly obtained while maintaining optical transmission exceeding 70% at wavelengths from 340 to 780 nm. The carrier densities of the film was obtain to the value 1.9×10{sup 18} cm{sup 3}, while the Hall mobility of the IGZO thin film was 16 cm{sup 2} V{sup −1}S{sup −1}.

  12. Characterization of nanostructured iron selenide thin films grown by chemical route at room temperature

    SciTech Connect

    Ubale, A.U.; Sakhare, Y.S.; Belkedkar, M.R.; Singh, Arvind

    2013-02-15

    Highlights: ► Nanostructured FeSe thin films were successfully synthesized at room temperature by CBD method. ► The XRD and EDAX characterization confirms nanocrystalline nature of FeSe. ► The SEM and AFM show microporous morphology with nanorods and nanoplates of FeSe. -- Abstract: Iron selenide thin films have been deposited onto glass substrates by using chemical bath deposition technique. Structural characterization of iron selenide thin films was carried out by means of X-ray diffraction and Fourier transforms infrared spectrum. The morphological characterization of FeSe thin film was carried out using scanning electron microscopy and atomic force microscopy, which revealed porous grain morphology of FeSe with some nano rectangular rods and plates grown on it. The as-deposited thin films exhibited optical band gap energy 2.60 eV. The as deposited FeSe thin films are semiconducting in nature with p-type electrical conductivity. The room temperature electrical resistivity is of the order of 1.1 × 10{sup 5} Ω-cm with activation energy 0.26 and 0.95 eV, respectively, in low and high temperature region.

  13. Biocompatibility of GaSb thin films grown by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Nishimoto, Naoki; Fujihara, Junko; Yoshino, Katsumi

    2017-07-01

    GaSb may be suitable for biological applications, such as cellular sensors and bio-medical instrumentation because of its low toxicity compared with As (III) compounds and its band gap energy. Therefore, the biocompatibility and the film properties under physiological conditions were investigated for GaSb thin films with or without a surface coating. GaSb thin films were grown on quartz substrates by RF magnetron sputtering, and then coated with (3-mercaptopropyl) trimethoxysilane (MPT). The electrical properties, surface morphology, and crystal structure of the GaSb thin film were unaffected by the MPT coating. The cell viability assay suggested that MPT-coated GaSb thin films are biocompatible. Bare GaSb was particularly unstable in pH9 buffer. Ga elution was prevented by the MPT coating, although the Ga concentration in the pH 9 buffer was higher than that in the other solutions. The surface morphology and crystal structure were not changed by exposure to the solutions, except for the pH 9 buffer, and the thin film properties of MPT-coated GaSb exposed to distilled water and H2O2 in saline were maintained. These results indicate that MPT-coated GaSb thin films are biocompatible and could be used for temporary biomedical devices.

  14. Structural characterization of InSb thin films grown by electrodeposition

    SciTech Connect

    Singh, Joginder Rajaram, P.

    2015-06-24

    In the present work we have grown InSb thin films on brass substrates, using the electrodeposition technique. The electrochemical baths used in the growth were made up of aqueous solutions of InCl{sub 3} and SbCl{sub 3} mixed together in various proportions. The films grown were characterized by X-Ray diffraction (XRD), Scanning Electron Microscopy (SEM), and Energy Dispersive Analysis of X-rays (EDAX). Compositional studies show that stoichiometric InSb films can be prepared from a bath containing 0.05M InCl{sub 3} and 0.04M SbCl{sub 3}. XRD studies reveal that the films grown are polycrystalline having the zinc blende structure with (111) orientation. Crystallite size, dislocation density and strain were calculated using the XRD results. Optical transmission spectra were recorded using an FTIR spectrophotometer. The value of direct band gap was found to be around 0.20 eV for the thin films having the best stoichiometry.

  15. Origin of resistivity change in NiO thin films studied by hard x-ray photoelectron spectroscopy

    NASA Astrophysics Data System (ADS)

    Calka, P.; Martinez, E.; Lafond, D.; Minoret, S.; Tirano, S.; Detlefs, B.; Roy, J.; Zegenhagen, J.; Guedj, C.

    2011-06-01

    We investigated origins of the resistivity change during the forming of NiO based resistive random access memories in a nondestructive way using hard x-ray photoelectron spectroscopy. Energy shifts and bandgap states observed after switching suggest that oxygen vacancies are created in the low resistive state. As a result conduction may occur via defects such as electrons traps and metallic nickel impurities. Migration of oxygen atoms seems to be the driving mechanism. This provides concrete evidence of the major role played by oxygen defects in decreasing resistivity. This is a key point since oxygen vacancies are particularly unstable and thus difficult to identify by physico-chemical analyses.

  16. Properties and orientation of antiferroelectric lead zirconate thin films grown by MOCVD.

    SciTech Connect

    Chen, N.

    1998-12-21

    Single-phase polycrystalline PbZrO{sub 3} (PZ) thin films, 3000-6000 {angstrom} thick, have been grown by metal-organic chemical vapor deposition (MOCVD) on (111)Pt/Ti/SiO{sub 2}/Si substrates at {approximately}525 C. X-ray diffraction analysis indicated that the PZ films grown on (111)Pt/Ti/SiO{sub 2}/Si (Pt/Ti/Si) showed preferred pseudocubic (110) orientation. In contrast, PZ films grown on 150 {angstrom} thick PbTiO{sub 3} (PT) template layers exhibited a pseudocubic (100) preferred orientation, and PZ films deposited on TiO{sub 2} template layers consisted of randomly oriented grains. The PZ films grown on Pt/Ti/Si with or without templates exhibited dielectric constants of 120-200 and loss tangents of 0.03-0.01. The PZ films with (110) orientation exhibited an electric-field-induced transformation from the antiferroelectric phase to the ferroelectric phase with a polarization of {approx}34 {micro}C/cm{sup 2}, and the energy that was stored during switching was 7.1 J/cm{sup 3}. The field needed to excite the ferroelectric state and that needed to revert to the antiferroelectric state were 350 and 250 kV/cm, respectively. Relationships between the MOCVD processing and the film microstructure and properties are discussed.

  17. From Fe3O4 /NiO bilayers to NiFe2O4 -like thin films through Ni interdiffusion

    NASA Astrophysics Data System (ADS)

    Kuschel, O.; Buß, R.; Spiess, W.; Schemme, T.; Wöllermann, J.; Balinski, K.; N'Diaye, A. T.; Kuschel, T.; Wollschläger, J.; Kuepper, K.

    2016-09-01

    Ferrites with (inverse) spinel structure display a large variety of electronic and magnetic properties, making some of them interesting for potential applications in spintronics. We investigate the thermally induced interdiffusion of Ni2 + ions out of NiO into Fe3O4 ultrathin films, resulting in off-stoichiometric nickel ferrite-like thin layers. We synthesized epitaxial Fe3O4 /NiO bilayers on Nb-doped SrTiO3(001) substrates by means of reactive molecular beam epitaxy. Subsequently, we performed an annealing cycle comprising three steps at temperatures of 400 ∘C , 600 ∘C , and 800 ∘C under an oxygen background atmosphere. We studied the changes of the chemical and electronic properties as result of each annealing step with help of hard x-ray photoelectron spectroscopy and found a rather homogeneous distribution of Ni and Fe cations throughout the entire film after the overall annealing cycle. For one sample we observed a cationic distribution close to that of the spinel ferrite NiFe2O4 . Further evidence comes from low-energy electron diffraction patterns indicating a spinel-type structure at the surface after annealing. Site- and element-specific hysteresis loops performed by x-ray magnetic circular dichroism uncovered the antiferrimagnetic alignment between the octahedral coordinated Ni2 + and Fe3 + ions and the Fe3 + ion in tetrahedral coordination. We find a quite low coercive field of 0.02 T, indicating a rather low defect concentration within the thin ferrite films.

  18. The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

    NASA Astrophysics Data System (ADS)

    Wang, Mengying; Thimont, Yohann; Presmanes, Lionel; Diao, Xungang; Barnabé, Antoine

    2017-10-01

    Non-stoichiometric Ni1-xO thin films were prepared on glass substrate by direct current reactive magnetron sputtering in a large range of oxygen partial pressure (0 ≤ pO2 ≤ 1 Pa). The dependence of the deposited film structure and properties on oxygen stoichiometry were systematically analyzed by X-ray diffraction, X-ray reflectivity, X-ray photoemission spectroscopy, Raman spectroscopy, atomic force microscopy, UV-vis measurements and electrical transport properties measurements. The deposition rates, surface morphology and opto-electrical properties are very sensitive to the oxygen partial pressure lower than 0.05 Pa due to the presence of metallic nickel cluster phase determined by X-ray diffraction, X-ray reflectivity and XPS spectroscopy. Presence of nanocrystallized NiO phase was highlighted even for pO2 = 0 Pa. For pO2 > 0.05 Pa, only the NiO phase was detected. Progressive appearance of Ni3+ species is characterized by a fine increase of the lattice parameter and (111) preferred orientation determined by grazing angle X-ray diffraction, fine increase of the X-ray reflectivity critical angle, displacement of the Ni 2p3/2 signal towards lower energy, significant increase of the electrical conductivity and decrease of the total transmittance. Quantification of Ni3+ by XPS method is discussed. We also showed that the use of Raman spectroscopy was relevant for demonstrating the presence of Ni3+ in the Ni1-xO thin films.

  19. Space-charge behavior of 'Thin-MOS' diodes with MBE-grown silicon films

    NASA Technical Reports Server (NTRS)

    Lieneweg, U.; Bean, J. C.

    1984-01-01

    Basic theoretical and experimental characteristics of a novel 'Thin-MOS' technology, which has promising aspects for integrated high-frequency devices up to several hundred gigahertz are presented. The operation of such devices depends on charge injection into undoped silicon layers of about 1000-A thickness, grown by molecular beam epitaxy on heavily doped substrates, and isolation by thermally grown oxides of about 100-A thickness. Capacitance-voltage characteristics measured at high and low frequencies agree well with theoretical ones derived from uni and ambipolar space-charge models. It is concluded that after oxidation the residual doping in the epilayer is less than approximately 10 to the 16th/cu cm and rises by 3 orders of magnitude at the substrate interface within less than 100 A and that interface states at the oxide interface can be kept low.

  20. Interface properties of thin oxide layers grown on strained SiGe layers at low temperatures

    NASA Astrophysics Data System (ADS)

    Mukhopadhyay, M.; Ray, S. K.; Ghosh, T. B.; Sreemany, M.; Maiti, C. K.

    1996-03-01

    The chemical state and the electrical properties of the interfaces of thin oxide films grown on strained 0268-1242/11/3/014/img8 layers using plasma and thermal oxidation have been studied in detail. X-ray photoelectron spectroscopy studies show no Ge pile-up at the oxide/substrate interface. In the case of plasma oxidation, Ge at the oxide surface is found to be in a fully oxidized state, while the formation of an intermediate oxidized state is observed in the case of low-temperature thermal oxidation. High-frequency (1 MHz) capacitance - voltage (C - V) and conductance - voltage (G - V) measurements have indicated the growth of good quality gate oxides. The fixed oxide charge and interface state densities are comparable to those of low-temperature-grown metal - oxide - semiconductor capacitors on Si with aluminium gates.

  1. Effect of aluminium doping on zinc oxide thin films grown by spray pyrolysis

    NASA Astrophysics Data System (ADS)

    Manouni, A. El; Manjón, F. J.; Mollar, M.; Marí, B.; Gómez, R.; López, M. C.; Ramos-Barrado, J. R.

    2006-01-01

    We report the structural, optical, and electrical characterization of aluminium-doped zinc oxide thin films grown by the spray pyrolysis method. We report the effect of Al concentration on the resistivity and on the X-ray diffraction, transmittance, photoluminescence and Raman scattering spectra of the films. The minimum resistivity is obtained for the sample with nominal Al concentration of 1%. An increase of the Al doping decreases the quality of the films. The loss of short-range order affects the photoluminescence and resistivity, although the optical transmittance is good, and the decrease of the long-range order affects X-ray diffraction and Raman spectra.

  2. Effect of thermal annealing on ZnO:Al thin films grown by spray pyrolysis

    NASA Astrophysics Data System (ADS)

    El Manouni, A.; Manjón, F. J.; Perales, M.; Mollar, M.; Marí, B.; Lopez, M. C.; Ramos Barrado, J. R.

    2007-07-01

    We report the effect of thermal annealing in air on the structural and optical properties of undoped and aluminium-doped (1%-4%) zinc oxide (AZO) thin films, grown by the spray pyrolysis technique on quartz substrates. Films were characterized by X-ray diffraction, low-temperature photoluminescence, electrical resistivity, and Raman spectroscopy after annealing at temperatures between 500 and 900 ∘C. Annealing in air improves the long-range order crystalline quality of the bulk crystals, but promotes a number of point defects in the surface affecting both the resistivity and the photoluminescence.

  3. Synthesis and characterization of TiO2 nanostructure thin films grown by thermal CVD

    NASA Astrophysics Data System (ADS)

    Rizal, Umesh; Das, Soham; Kumar, Dhruva; Swain, Bhabani S.; Swain, Bibhu P.

    2016-04-01

    Thermal Chemical Vapor Deposition (CVD) deposited Titanium dioxide nanostructures (TiO2-NSs) were grown by using Ti powder and O2 precursors on Si/SiO2 (100) substrate. The microstructure and vibration properties of TiO2-NSs were characterized by Fourier transform infrared (FTIR), SEM, and photoluminescence (PL) spectroscopy. The role of O2 flow rate on TiO2-NSs revealed decreased deposition rate, however, surface roughness has been increased resulted into formation of nanostructure thin films.

  4. Unexpected behaviour of one Pb monolayer deposited on aluminum oxide thin film grown on Ag(111)

    SciTech Connect

    Vizzini, Sébastien Bertoglio, M.; Oughaddou, Hamid; Hoarau, J. Y.; Biberian, J. P.; Aufray, B.

    2013-12-23

    Using scanning tunneling microscopy (STM), Auger electron spectroscopy, and low energy electron diffraction, we have observed a surprising complete dissolution at room temperature of one lead monolayer deposited by evaporation on an aluminum oxide thin film (∼0.8 nm thick) previously grown on Ag (111). We have observed the quasi-instantaneous diffusion of the lead deposit through the oxide layer to the silver/oxide interface. After the diffusion process, lead atoms form a Moiré superstructure, which is characterized by STM through the oxide layer. This unexpected behavior puts in light the very weak interaction between the aluminum oxide and the silver substrate.

  5. Growth and atomic structure of tellurium thin films grown on Bi2Te3

    NASA Astrophysics Data System (ADS)

    Okuyama, Yuma; Sugiyama, Yuya; Ideta, Shin-ichiro; Tanaka, Kiyohisa; Hirahara, Toru

    2017-03-01

    We have grown tellurium (Te) thin films on Bi2Te3 and investigated the atomic structure. From low-energy electron diffraction (LEED) measurements, we found that the Te films are [10 1 bar0]-oriented with six domains. A detailed analysis of the reflection high-energy electron diffraction (RHEED) pattern revealed that the films are strained with the in-plane lattice constant compressed by ∼1.5% compared to the bulk value due to the epitaxy between Te and Bi2Te3. These films will be interesting systems to investigate the predicted topological phases that occur in strained Te.

  6. Fullerenelike arrangements in carbon nitride thin films grown by direct ion beam sputtering

    SciTech Connect

    Gago, R.; Abrasonis, G.; Muecklich, A.; Moeller, W.; Czigany, Zs.; Radnoczi, G.

    2005-08-15

    Carbon nitride (CN{sub x}) thin films were grown by direct N{sub 2}/Ar ion beam sputtering of a graphite target at moderate substrate temperatures (300-750 K). The resulting microstructure of the films was studied by high-resolution transmission electron microscopy. The images showed the presence of curved basal planes in fullerenelike arrangements. The achievement and evolution of these microstructural features are discussed in terms of nitrogen incorporation, film-forming flux, and ion bombardment effects, thus adding to the understanding of the formation mechanisms of curved graphitic structures in CN{sub x} materials.

  7. One-dimensional edge state of Bi thin film grown on Si(111)

    SciTech Connect

    Kawakami, Naoya; Lin, Chun-Liang; Kawai, Maki; Takagi, Noriaki; Arafune, Ryuichi

    2015-07-20

    The geometric and electronic structures of the Bi thin film grown on Si(111) were investigated by using scanning tunneling microscopy and spectroscopy. We have found two types of edges, one of which hosts an electronic state localized one-dimensionally. We also revealed the energy dispersion of the localized edge state from the evolution of quasiparticle interference patterns as a function of energy. These spectroscopic findings well reproduce those acquired for the cleaved surface of the bulk Bi crystal [I. K. Drozdov et al., Nat. Phys. 10, 664 (2014)]. The present results indicate that the deposited Bi film provides a tractable stage for further scrutiny of the one-dimensional edge state.

  8. Preparation of AgInSe2 thin films grown by vacuum evaporation method

    NASA Astrophysics Data System (ADS)

    Matsuo, H.; Yoshino, K.; Ikari, T.

    2006-09-01

    Polycrystalline AgInSe2 thin films were successfully grown on glass substrates by an evaporation method. The starting materials were stoichiometrically mixed Ag2Se and In2Se3 powders. X-ray diffraction revealed that the sample annealed at 600 °C consisted of AgInSe2 single phase, with (112) orientation and a large grain size. The lattice constant (a axis) was close to JCPDS values. From optical transmittance and reflectance measurements, the bandgap energy was estimated to be 1.17 eV.

  9. RAPID COMMUNICATION: ? thin film bilayers grown by pulsed laser ablation deposition

    NASA Astrophysics Data System (ADS)

    Singh, S. K.; Palmer, S. B.; McK Paul, D.; Lees, M. R.

    1996-09-01

    We have grown superconducting thin films of 0022-3727/29/9/044/img2 (Y-123) on 0022-3727/29/9/044/img3 (PCMO) buffer layers and PCMO overlayers on Y-123 thin films using pulsed laser ablation deposition. For both sets of films below 50 K, the Y-123 layer is superconducting and the zero-field cooled PCMO layer is insulating. The application of a magnetic field of 8 T results in an insulator - metal transition in the PCMO layer. This field-induced conducting state is stable in zero magnetic field at low temperature. The PCMO layer can be returned to an insulating state by annealing above 100 K. This opens the way for the construction of devices incorporating these oxide materials in which the electronic properties of key components such as the substrate or the barrier layer can be switched in a controlled way by the application of a magnetic field.

  10. Microhardness studies on thin carbon films grown on P-type, (100) silicon

    NASA Technical Reports Server (NTRS)

    Kolecki, J. C.

    1982-01-01

    A program to grow thin carbon films and investigate their physical and electrical properties is described. Characteristics of films grown by rf sputtering and vacuum arc deposition on p type, (100) silicon wafers are presented. Microhardness data were obtained from both the films and the silicon via the Vickers diamond indentation technique. These data show that the films are always harder than the silicon, even when the films are thin (of the order of 1000 A). Vacuum arc films were found to contain black carbon inclusions of the order of a few microns in size, and clusters of inclusions of the order of tens of microns. Transmission electron diffraction showed that the films being studied were amorphous in structure.

  11. Characterization and Fabrication of ZnO Nanowires Grown on AlN Thin Film

    SciTech Connect

    Yousefi, Ramin; Kamaluddin, Burhanuddin; Ghoranneviss, Mahmood; Hajakbari, Fatemeh

    2009-07-07

    In this paper, we report ZnO nanowires grown on AlN thin film deposited on glass as substrate by physical vapour deposition. The temperature of substrates was kept between 600 deg. C and 500 deg. C during the growth. The typical average diameters of the obtained nanowires on substrate at 600 deg. C and 500 deg. C was about 57 nm and 22 nm, respectively with several micrometers in lengths. X-ray diffraction and Auger spectroscopy results showed Al diffused from AlN thin film into ZnO nanowires for sample at high temperature zone. In the photoluminescence spectra two emission bands appeared, one related to ultraviolet emission with a strong peak at 380-382 nm, and another related to deep level emission with a weak peak at 510 nm.

  12. Europium and samarium doped calcium sulfide thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    Christoulakis, S.; Suchea, M.; Katsarakis, N.; Koudoumas, E.

    2007-07-01

    Europium and samarium doped calcium sulfide thin films (CaS:Eu,Sm) with different thickness were prepared by the pulsed laser deposition technique using sintered targets. A typical homemade deposition chamber and XeCl excimer laser (308 nm) were employed and the films were deposited in helium atmosphere onto silicon and corning glass substrates. Structural investigations carried out by X-ray diffraction and atomic force microscopy showed a strong influence of the deposition parameters on the film properties. The films grown had an amorphous or polycrystalline structure depending on growth temperature and the number of pulses used, the same parameters affecting the film roughness, the grain shape and dimensions, the film thickness and the optical transmittance. This work indicates that pulsed laser deposition can be a suitable technique for the preparation of CaS:Eu,Sm thin films, the film characteristics being controlled by the growth conditions.

  13. Highly crystalline MoS{sub 2} thin films grown by pulsed laser deposition

    SciTech Connect

    Serrao, Claudy R.; You, Long; Gadgil, Sushant; Hu, Chenming; Salahuddin, Sayeef; Diamond, Anthony M.; Hsu, Shang-Lin; Clarkson, James; Carraro, Carlo; Maboudian, Roya

    2015-02-02

    Highly crystalline thin films of MoS{sub 2} were prepared over large area by pulsed laser deposition down to a single monolayer on Al{sub 2}O{sub 3} (0001), GaN (0001), and SiC-6H (0001) substrates. X-ray diffraction and selected area electron diffraction studies show that the films are quasi-epitaxial with good out-of-plane texture. In addition, the thin films were observed to be highly crystalline with rocking curve full width half maxima of 0.01°, smooth with a RMS roughness of 0.27 nm, and uniform in thickness based on Raman spectroscopy. From transport measurements, the as-grown films were found to be p-type.

  14. Structural and morphological properties of ITO thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ghorannevis, Z.; Akbarnejad, E.; Ghoranneviss, M.

    2015-10-01

    Physical properties of transparent and conducting indium tin oxide (ITO) thin films grown by radiofrequency (RF) magnetron sputtering are studied systematically by changing deposition time. The X-ray diffraction (XRD) data indicate polycrystalline thin films with grain orientations predominantly along the (2 2 2) and (4 0 0) directions. From atomic force microscopy (AFM) it is found that by increasing the deposition time, the roughness of the film increases. Scanning electron microscopy (SEM) images show a network of a high-porosity interconnected nanoparticles, which approximately have a pore size ranging between 20 and 30 nm. Optical measurements suggest an average transmission of 80 % for the ITO films. Sheet resistances are investigated using four-point probes, which imply that by increasing the film thickness the resistivities of the films decrease to 2.43 × 10-5 Ω cm.

  15. A study on the epitaxial Bi2Se3 thin film grown by vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Lin, Yen-Cheng; Chen, Yu-Sung; Lee, Chao-Chun; Wu, Jen-Kai; Lee, Hsin-Yen; Liang, Chi-Te; Chang, Yuan Huei

    2016-06-01

    We report the growth of high quality Bi2Se3 thin films on Al2O3 substrates by using chemical vapor deposition. From the atomic force microscope, x-ray diffraction and transmission electron microscope measurements we found that the films are of good crystalline quality, have two distinct domains and can be grown epitaxially on the Al2O3 substrate. Carrier concentration in the sample is found to be 1.1 × 1019 cm-3 between T = 2 K to T = 300 K, and electron mobility can reach 954 cm2/V s at T = 2 K. Weak anti-localization effect is observed in the low temperature magneto-transport measurement for the sample which indicates that the thin film has topological surface state.

  16. Properties of boron-doped ZnO thin films grown by using MOCVD

    NASA Astrophysics Data System (ADS)

    Choi, In-Hwan

    2013-11-01

    Boron-doped ZnO thin films were prepared by using metal organic chemical-vapor deposition (MOCVD) with diethyl zinc and water as precursors and B2H6 as the dopant gas. The effects of the flow rates of H2O and B2H6 on the growth and the electrical properties of boron-doped ZnO thin film were investigated. The maximum carrier concentration and mobility and the minimum resistivity obtained under these experimental conditions were 7 × 1020 /cm3, 42 cm2 /V·sec and 4 × 10-4 Ω·cm, respectively, at room temperature. The electrical properties, growth rates, transmittances, and surface morphologies of the ZnO:B films grown using MOCVD are strongly affected by growth conditions such as the relative flow rates of the precursors and dopant gases and the chamber pressure, and these effects are discussed in detail in this article.

  17. Diode behavior in ultra-thin low temperature ALD grown zinc-oxide on silicon

    NASA Astrophysics Data System (ADS)

    El-Atab, Nazek; Alqatari, Samar; Oruc, Feyza B.; Souier, Tewfic; Chiesa, Matteo; Okyay, Ali K.; Nayfeh, Ammar

    2013-10-01

    A thin-film ZnO(n)/Si(p+) heterojunction diode is demonstrated. The thin film ZnO layer is deposited by Atomic Layer Deposition (ALD) at different temperatures on a p-type silicon substrate. Atomic force microscopy (AFM) AC-in-Air method in addition to conductive AFM (CAFM) were used for the characterization of ZnO layer and to measure the current-voltage characteristics. Forward and reverse bias n-p diode behavior with good rectification properties is achieved. The diode with ZnO grown at 80°C exhibited the highest on/off ratio with a turn-on voltage (VON) ˜3.5 V. The measured breakdown voltage (VBR) and electric field (EBR) for this diode are 5.4 V and 3.86 MV/cm, respectively.

  18. Variable range hopping crossover and magnetotransport in PLD grown Sb doped ZnO thin film

    NASA Astrophysics Data System (ADS)

    Mukherjee, Joynarayan; Mannam, Ramanjaneyulu; Ramachandra Rao, M. S.

    2017-04-01

    We report on the variable range hopping (VRH) crossover in the electrical transport of Sb doped ZnO (SZO) thin film. Structural, chemical, electrical and magnetotransport properties were carried out on SZO thin film grown by pulsed laser deposition. X-photoelectron spectroscopy study confirms the presence of both Sb3+(33%) and Sb5+(67%) states. Sb doped ZnO thin film shows n-type behavior which is attributed to the formation of SbZn and/or SbZn–VZn defect complex. Temperature dependent resistivity measurement showed that in a low temperature regime (< 90 K) transport is governed by the 3D-VRH mechanism. A crossover from 3D-VRH to Efros–Shklovoski VRH was observed around 12 K. Negative magnetoresistance (MR) is observed in the entire temperature range (300–5 K), however, there is an upturn in the MR behavior at 5 K suggesting the existence of a positive component. The MR behavior of Sb doped ZnO thin films is explained by the Khosla and Fischer model.

  19. Strain induced modulation of the correlated transport in epitaxial Sm0.5Nd0.5NiO3 thin films.

    PubMed

    Zhang, L; Gardner, H J; Chen, X G; Singh, V R; Hong, X

    2015-04-10

    We report a study of the effect of epitaxial strain on the correlated transport properties of 2-40 nm Sm0.5Nd0.5NiO3 (SNNO) films grown on different substrates. The metal-insulator transition (MIT) temperature T(MI) of the SNNO films increases with increasing tensile strain. While films on (0 0 1) LaAlO3 and (1 1 0) NdGaO3 substrates exhibit a sharp MIT and thermal hysteresis in the cooling-heating cycle, signaling a first-order transition, films on (0 0 1) SrTiO3 show a broad, second-order MIT. Hall effect measurements reveal hole-type charge carriers and thermally activated temperature dependence of the carrier density below T(MI). The corresponding activation energy is ∼80 meV for films on LaAlO3 and NdGaO3, and is suppressed to 25 meV for films on SrTiO3. The carrier mobility in the metallic state and variable range hopping (VRH) transport at a low temperature point significantly enhanced electron localization in SNNO on STO, which we believe is not simply driven by extrinsic effects such as oxygen vacancies, but rather is an intrinsic characteristic for films subject to tensile strain due to the elongated Ni-O bond and hence enhanced dynamic Jahn-Teller distortion. In ultrathin films above the electrical dead layer thickness (2-3 nm), we observe a more than 100 K increase of T(MI) for films on LaAlO3, which has been correlated with a crossover from 3D to 2D transport as revealed from VRH. We attribute the distinct transport characteristics to strain induced modulation of various energy scales associated with the Ni-O-Ni bond angle and Ni-O bond length, which collectively determine the delocalization bandwidth of the system.

  20. Heterojunction oxide thin-film transistors with unprecedented electron mobility grown from solution

    PubMed Central

    Faber, Hendrik; Das, Satyajit; Lin, Yen-Hung; Pliatsikas, Nikos; Zhao, Kui; Kehagias, Thomas; Dimitrakopulos, George; Amassian, Aram; Patsalas, Panos A.; Anthopoulos, Thomas D.

    2017-01-01

    Thin-film transistors made of solution-processed metal oxide semiconductors hold great promise for application in the emerging sector of large-area electronics. However, further advancement of the technology is hindered by limitations associated with the extrinsic electron transport properties of the often defect-prone oxides. We overcome this limitation by replacing the single-layer semiconductor channel with a low-dimensional, solution-grown In2O3/ZnO heterojunction. We find that In2O3/ZnO transistors exhibit band-like electron transport, with mobility values significantly higher than single-layer In2O3 and ZnO devices by a factor of 2 to 100. This marked improvement is shown to originate from the presence of free electrons confined on the plane of the atomically sharp heterointerface induced by the large conduction band offset between In2O3 and ZnO. Our finding underscores engineering of solution-grown metal oxide heterointerfaces as an alternative strategy to thin-film transistor development and has the potential for widespread technological applications. PMID:28435867

  1. Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

    NASA Astrophysics Data System (ADS)

    Härkönen, J.; Ott, J.; Mäkelä, M.; Arsenovich, T.; Gädda, A.; Peltola, T.; Tuovinen, E.; Luukka, P.; Tuominen, E.; Junkes, A.; Niinistö, J.; Ritala, M.

    2016-09-01

    In this report we cover two special applications of Atomic Layer Deposition (ALD) thin films to solve these challenges of the very small size pixel detectors. First, we propose to passivate the p-type pixel detector with ALD grown Al2O3 field insulator with a negative oxide charge instead of using the commonly adopted p-stop or p-spray technologies with SiO2, and second, to use plasma-enhanced ALD grown titanium nitride (TiN) bias resistors instead of the punch through biasing structures. Surface passivation properties of Al2O3 field insulator was studied by Photoconductive Decay (PCD) method and our results indicate that after appropriate annealing Al2O3 provides equally low effective surface recombination velocity as thermally oxidized Si/SiO2 interface. Furthermore, with properly designed annealing steps, the TiN thin film resistors can be tuned to have up to several MΩ resistances with a few μm of physical size required in ultra-fine pitch pixel detectors.

  2. Characterization of PLD grown WO3 thin films for gas sensing

    NASA Astrophysics Data System (ADS)

    Boyadjiev, Stefan I.; Georgieva, Velichka; Stefan, Nicolaie; Stan, George E.; Mihailescu, Natalia; Visan, Anita; Mihailescu, Ion N.; Besleaga, Cristina; Szilágyi, Imre M.

    2017-09-01

    Tungsten trioxide (WO3) thin films were grown by pulsed laser deposition (PLD) with the aim to be applied in gas sensors. The films were studied by atomic force microscopy (AFM), X-ray diffraction (XRD), Fourier transform infrared (FTIR) spectroscopy and profilometry. To study the gas sensing behavior of these WO3 films, they were deposited on quartz resonators and the quartz crystal microbalance (QCM) method was applied to analyze their gas sensitivity. Synthesis of tetragonal-WO3 films starting from a target with predominantly monoclinic WO3 phase was observed. The films deposited at 300 °C presented a surface topology favorable for the sorption properties, consisting of a film matrix with protruding craters/cavities. QCM prototype sensors with such films were tested for NO2 sensing. The PLD grown WO3 thin films show good sensitivity and fast reaction at room temperature, even in as-deposited state. With the presented technology, the manufacturing of QCM gas sensors is simple, fast and cost-effective, and it is also suitable for energy-effective portable equipment for on-line monitoring of environmental changes.

  3. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition

    NASA Astrophysics Data System (ADS)

    Chiu, Hsiang-Chih; Chang, Huan-Pu; Lo, Fang-Yu; Yeh, Yu-Ting; Department of Physics, National Taiwan Normal University Collaboration

    Zinc Oxide (ZnO) nanostructures have potential applications in nano-electro-mechanical systems (NEMS) due to their unique physical properties. ZnO is also an excellent lubricant and hence a promising candidate for protective coatings in NEMS. By means of atomic force microscopy (AFM), we have investigated the frictional properties of ZnO thin films prepared by pulsed laser deposition technique. In addition, UV illumination is used to convert the surface wettability of ZnO thin films from being more hydrophobic to superhydrophilic via the photo-catalyst effect. We found that the frictional properties of the UV illuminated, superhydrophilic ZnO surface are strongly dependent on the environment humidity. While for hydrophobic ZnO, no such dependence is found. The observed frictional behaviors can be explained by the interplay between the surface roughness, environmental humidity and the presence of nanoscale capillary condensation forming between surface asperities at the tip-ZnO contact. Our results might find applications in future ZnO related NEMS. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition.

  4. Two-dimensional Covalent Organic Framework Thin Films Grown in Flow.

    PubMed

    Bisbey, Ryan P; DeBlase, Catherine R; Smith, Brian J; Dichtel, William R

    2016-09-14

    Two-dimensional covalent organic frameworks (2D COFs) are crystalline polymer networks whose modular 2D structures and permanent porosity motivate efforts to integrate them into sensing, energy storage, and optoelectronic devices. These applications require forming the material as a thin film instead of a microcrystalline powder, which has been achieved previously by including a substrate in the reaction mixture. This approach suffers from two key drawbacks: COF precipitates form concurrently and contaminate the film, and variable monomer and oligomer concentrations during the polymerization provide poor control over film thickness. Here we address these challenges by growing 2D COF thin films under continuous flow conditions. Initially homogeneous monomer solutions polymerize while pumped through heated tubing for a given residence time, after which they pass over a substrate. When the residence time and conditions are chosen judiciously, 2D COF powders form downstream of the substrate, and the chemical composition of the solution at the substrate remains constant. COF films grown in flow exhibit constant rates of mass deposition, enabling thickness control as well as access to thicker films than are available from previous static growth procedures. Notably, the crystallinity of COF films is observed only at longer residence times, suggesting that oligomeric and polymeric species play an important role in forming the 2D COF lattice. This approach, which we demonstrate for four different frameworks, is both a simple and powerful method to control the formation of COF thin films.

  5. Induced polarized state in intentionally grown oxygen deficient KTaO{sub 3} thin films

    SciTech Connect

    Mota, D. A.; Romaguera-Barcelay, Y.; Tkach, A.; Agostinho Moreira, J.; Almeida, A.; Perez de la Cruz, J.; Vilarinho, P. M.; Tavares, P. B.

    2013-07-21

    Deliberately oxygen deficient potassium tantalate thin films were grown by RF magnetron sputtering on Si/SiO{sub 2}/Ti/Pt substrates. Once they were structurally characterized, the effect of oxygen vacancies on their electric properties was addressed by measuring leakage currents, dielectric constant, electric polarization, and thermally stimulated depolarization currents. By using K{sub 2}O rich KTaO{sub 3} targets and specific deposition conditions, KTaO{sub 3-{delta}} oxygen deficient thin films with a K/Ta = 1 ratio were obtained. Room temperature X-ray diffraction patterns show that KTaO{sub 3-{delta}} thin films are under a compressive strain of 2.3% relative to KTaO{sub 3} crystals. Leakage current results reveal the presence of a conductive mechanism, following the Poole-Frenkel formalism. Furthermore, dielectric, polarization, and depolarization current measurements yield the existence of a polarized state below T{sub pol} {approx} 367 Degree-Sign C. A Cole-Cole dipolar relaxation was also ascertained apparently due to oxygen vacancies induced dipoles. After thermal annealing the films in an oxygen atmosphere at a temperature above T{sub pol}, the aforementioned polarized state is suppressed, associated with a drastic oxygen vacancies reduction emerging from annealing process.

  6. Photoluminescence of localized excitons in ZnCdO thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Wu, T. Y.; Huang, Y. S.; Hu, S. Y.; Lee, Y. C.; Tiong, K. K.; Chang, C. C.; Shen, J. L.; Chou, W. C.

    2016-07-01

    We have investigated the luminescence characteristics of Zn1-xCdxO thin films with different Cd contents grown by molecular beam epitaxy system. The temperature-dependent photoluminescence (PL) and excitation power-dependent PL spectra were measured to clarify the luminescence mechanisms of the Zn1-xCdxO thin films. The peak energy of the Zn1-xCdxO thin films with increasing the Cd concentration is observed as redshift and can be fitted by the quadratic function of alloy content. The broadened full-width at half-maximum (FWHM) estimated from the 15 K PL spectra as a function of Cd content shows a larger deviation between the experimental values and theoretical curve, which indicates that experimental FWHM values are affected not only by alloy compositional disorder but also by localized excitons occupying states in the tail of the density of states. The Urbach energy determined from an analysis of the lineshape of the low-energy side of the PL spectrum and the degree of localization effect estimated from the temperature-induced S-shaped PL peak position described an increasing mean exciton-localization effects in ZnCdO films with increasing the Cd content. In addition, the PL intensity and peak position as a function of excitation power are carried out to clarify the types of radiative recombination and the effects of localized exciton in the ZnCdO films with different Cd contents.

  7. Pentacene islands grown on ultra-thin SiO 2

    NASA Astrophysics Data System (ADS)

    Conrad, B. R.; Cullen, W. G.; Riddick, B. C.; Williams, E. D.

    2009-02-01

    Ultra-thin oxide (UTO) films were grown on Si(1 1 1) in ultrahigh vacuum at room temperature and characterized by scanning tunneling microscopy. The ultra-thin oxide films were then used as substrates for room temperature growth of pentacene. The apparent height of the first layer is 1.57 ± 0.05 nm, indicating "standing up" pentacene grains in the thin film phase were formed. Pentacene is molecularly resolved in the second and subsequent molecular layers. The measured in-plane unit cell for the pentacene (0 0 1) plane ( ab plane) is a = 0.76 ± 0.01 nm, b = 0.59 ± 0.01 nm, and γ = 87.5 ± 0.4°. The films are unperturbed by the UTO's short-range spatial variation in tunneling probability, and reduce its corresponding effective roughness and correlation exponent with increasing thickness. The pentacene surface morphology follows that of the UTO substrate, preserving step structure, the long range surface rms roughness of ˜0.1 nm, and the structural correlation exponent of ˜1.

  8. The magnetic and chemical structural property of the epitaxially-grown multilayered thin film

    NASA Astrophysics Data System (ADS)

    Lee, Hwachol

    L10 FePt- and Fe-related alloys such as FePtRh, FeRh and FeRhPd have been studied for the high magnetocrystalline anisotropy and magnetic phase transition property for the future application. In this work, the thin film structural and magnetic property is investigated for the selected FePtRh and FeRhPd alloys. The compositionally-modulated L10 FePtRh multilayered structure is grown epitaxially on a-plane Al2O3 with Cr and Pt buffer layer at 600degC growth temperature by DC sputtering technique and examined for the structural, interfacial and magnetic property. For the epitaxially grown L10 [Fe50Pt45Rh5 (FM) (10nm) / Fe50Pt25Rh25 (AFM) (20nm)]x8 superlattice, the magnetically and chemically sharp interface formation between layers was observed in X-ray diffraction, transmission electron microscopy and polarized neutron reflectivity measurements with the negligible exchange bias at room and a slight coupling effect at lower temperature regime. For FeRhPd, the magnetic phase transition of epitaxially-grown 111-oriented Fe46Rh48Pd6 thin film is studied. The applied Rhodium buffer layer on a-plane Al2O3 (11 20) at 600degC shows the extraordinarily high quality of epitaxial film in (111) orientation, where two broad and coherent peak in rocking curve, and Laue oscillations are observed. The epitaxially-grown Pd-doped FeRh on Pt (111) grown at 600degC, 700degC exhibits the co-existing stable L10 (111) and B2 (110) structures and magnetic phase transition around 300degC. On the other hand, the partially-ordered FeRhPd structure grown at 400degC, 500degC shows background high ferromagnetic state over 5K˜350K temperature. For the reduced thickness of Fe46Rh48Pd 6, the ferromagnetic state becomes dominant with a reduced portion of the film undergoing a magnetic phase transition. For some epitaxial FeRhPd film, the spin-glass-like disordered state is also observed in field dependent SQUID measurement. For the tri-layered FeRhPd with thin Pt spacer, the background

  9. Microstructural Evolution and Domain Structures of Flux-grown Ferroelectric Thin Films

    NASA Astrophysics Data System (ADS)

    Burch, Matthew James

    Barium titanate is one of the most commonly utilized dielectric materials for commercial applications. As devices continue to scale smaller, it is necessary to find processing routes that allow for the integration of high-permittivity barium titanate into the thin film geometry. In the bulk, high permittivity barium titanate can be produced at high processing temperatures (>1250°C). This is several hundred degrees higher than many low temperature substrates are able to withstand, which makes integration of high-permittivity barium titanate onto these substrates a challenge.One method to lower the processing temperature and maintain bulk-like permittivity of barium titanate thin films is through the addition of a liquid forming flux. The fluxing agent increases the kinetics of the system while encouraging densification. This increase in kinetics results in large-grained, dense samples, with high dielectric properties at relatively low processing temperatures. In this dissertation, the underlying mechanisms of how the flux system actually impacts the microstructural evolution of physically vapor deposited barium titanate thin films on sapphire substrates is explored. The flux-system utilized is the barium-borate system (BaOB2O3). It will be shown that the flux system results in large-grained, dense barium titanate thin films grown on sapphire. However, the evolution of the microstructure depends on a complex interaction between the liquid forming flux, a reaction between the sapphire substrate and barium titanate, the resulting reactionary phase of BaAl2O4, and {111}-barium titanate twins. (Abstract shortened by ProQuest.).

  10. Effects of sapphire annealing on the structural properties of AIN thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Liu, Yun; Zhang, Jia

    2010-03-01

    The effects of sapphire annealing on high-quality AlN growth by molecular beam epitaxy have been studied. AlN thin films grown on annealed sapphire (1200 °C, 12 h) were hole-free. The full width at half maximum of the (0 0 0 2) and (1 0 1bar 5)ω-rocking curves for 260 nm-thick AlN thin films grown on annealed sapphires were 200 and 900 arcsec, respectively. The substantial improvement of AlN quality is ascribed to reduction of dislocation density by sapphire annealing.

  11. 90{degree} Magnetization Switching in Thin Fe Films Grown on Stepped Cr(001)

    SciTech Connect

    Escorcia-Aparicio, E.J.; Choi, H.J.; Ling, W.L.; Kawakami, R.K.; Qiu, Z.Q.

    1998-09-01

    The ferromagnetic/antiferromagnetic interfacial interaction was investigated in thin Fe films grown on stepped Cr(001) with the steps parallel to the [100] direction. Above the N{acute e}el temperature of the Cr, the atomic steps induce a uniaxial magnetic anisotropy with the easy axis parallel to the step edges. Below the N{acute e}el temperature, the Fe-Cr interfacial interaction favors the Fe magnetization perpendicular to the step edges. The competition between the Fe-Cr interaction and the step-induced magnetic anisotropy results in an in-plane 90{degree} magnetization switching from perpendicular to the step edges at low step-density to parallel to the step edges at high step density. {copyright} {ital 1998} {ital The American Physical Society }

  12. Optical and mechanical properties of nanocrystalline ZrC thin films grown by pulsed laser deposition.

    DOE PAGES

    Craciun, D.; Socol, G.; Lambers, E.; ...

    2015-01-17

    Thin ZrC films (<500 nm) were grown on (100) Si substrates at a substrate temperature of 500 °C by the pulsed laser deposition (PLD) technique using a KrF excimer laser under different CH4 pressures. Glancing incidence X-ray diffraction showed that films were nanocrystalline, while X-ray reflectivity studies found out films were very dense and exhibited a smooth surface morphology. Optical spectroscopy data shows that the films have high reflectivity (>90%) in the infrared region, characteristic of metallic behavior. Nanoindentation results indicated that films deposited under lower CH4 pressures exhibited slightly higher nanohardness and Young modulus values than films deposited undermore » higher pressures. As a result, tribological characterization revealed that these films exhibited relatively high wear resistance and steady-state friction coefficients on the order of μ = 0.4.« less

  13. Preparation and characterization of LaMnO3 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Aruta, C.; Angeloni, M.; Balestrino, G.; Boggio, N. G.; Medaglia, P. G.; Tebano, A.; Davidson, B.; Baldini, M.; Di Castro, D.; Postorino, P.; Dore, P.; Sidorenko, A.; Allodi, G.; De Renzi, R.

    2006-07-01

    We have grown LaMnO3 thin films on (001) LaAlO3 substrates by pulsed laser deposition. X-ray diffraction confirms that the films are only slightly relaxed and are oriented "square on square" relative to the substrate. The measured Raman spectra closely resemble that observed in bulk LaMnO3, which indicates no relevant distortions of the MnO6 octahedra induced by the epitaxial strain. Therefore, no detectable changes in the lattice dynamics occurred in our LaMnO3 strained films relative to the bulk case. Mn55 nuclear magnetic resonance identifies the presence of localized Mn4+ states. Superconducting quantum interference device magnetization measures TN=131(3)K and a saturation moment μ =1.09μB/Mn, revealing a small concentration of Mn4+ and placing our films within the antiferromagnetic insulating phase.

  14. Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Rampelberg, Geert; Schaekers, Marc; Martens, Koen; Xie, Qi; Deduytsche, Davy; De Schutter, Bob; Blasco, Nicolas; Kittl, Jorge; Detavernier, Christophe

    2011-04-01

    Thin films of vanadium dioxide (VO2) have been grown by a low temperature atomic layer deposition process at 150 °C using tetrakis[ethylmethylamino]vanadium as a vanadium source and ozone as reactant gas. Films deposited on SiO2 were amorphous, but during a thermal treatment at 450 °C tetragonal VO2(R) was formed. During in situ x-ray diffraction measurements, the semiconductor-metal transition was observed as a reversible transition between VO2(M1) and VO2(R) near 67 °C. Correlated with this phase change, a reversible change in resistivity was observed of more than two orders of magnitude for a film of 42 nm thickness.

  15. Structural and magnetic properties of MBE grown GeMnN2 thin films

    SciTech Connect

    Liu, Y; Lazarov, V. K.; Cheung, S.H.; Keavney, D.J.; Gai, Zheng; Gajdardziska-Josifovska, M; Weinert, M; Li, Lian

    2012-01-01

    Epitaxial GeMnN{sub 2} thin films are synthesized by plasma-assisted molecular beam epitaxy. Transmission electron microscopy and x-ray diffraction measurements confirm that it is the orthorhombic variant, consistent with the predictions of first-principles calculations. The magnetic properties of the films are related to defects, with samples grown under Ge-rich conditions exhibiting a net magnetic moment above room temperature. These results are explained by first-principles calculations, indicating that the preferential substitution of one magnetic sublattice of GeMnN{sub 2} by impurities and/or intrinsic defects such as Ge antisites produces a net magnetic moment in an antiferromagnetic background, and also introduces spin-polarized carriers near the Fermi level.

  16. Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy.

    PubMed

    Gu, Yi; Wang, Kai; Zhou, Haifei; Li, Yaoyao; Cao, Chunfang; Zhang, Liyao; Zhang, Yonggang; Gong, Qian; Wang, Shumin

    2014-01-13

    InPBi thin films have been grown on InP by gas source molecular beam epitaxy. A maximum Bi composition of 2.4% is determined by Rutherford backscattering spectrometry. X-ray diffraction measurements show good structural quality for Bi composition up to 1.4% and a partially relaxed structure for higher Bi contents. The bandgap was measured by optical absorption, and the bandgap reduction caused by the Bi incorporation was estimated to be about 56 meV/Bi%. Strong and broad photoluminescence signals were observed at room temperature for samples with xBi < 2.4%. The PL peak position varies from 1.4 to 1.9 μm, far below the measured InPBi bandgap.

  17. Optical and mechanical properties of nanocrystalline ZrC thin films grown by pulsed laser deposition.

    SciTech Connect

    Craciun, D.; Socol, G.; Lambers, E.; McCumiskey, E. J.; Taylor, C. R.; Martin, C.; Argibay, Nicolas; Craciun, V.; Tanner, D. B.

    2015-01-17

    Thin ZrC films (<500 nm) were grown on (100) Si substrates at a substrate temperature of 500 °C by the pulsed laser deposition (PLD) technique using a KrF excimer laser under different CH4 pressures. Glancing incidence X-ray diffraction showed that films were nanocrystalline, while X-ray reflectivity studies found out films were very dense and exhibited a smooth surface morphology. Optical spectroscopy data shows that the films have high reflectivity (>90%) in the infrared region, characteristic of metallic behavior. Nanoindentation results indicated that films deposited under lower CH4 pressures exhibited slightly higher nanohardness and Young modulus values than films deposited under higher pressures. As a result, tribological characterization revealed that these films exhibited relatively high wear resistance and steady-state friction coefficients on the order of μ = 0.4.

  18. Electronic and magnetic structure of ultra-thin Ni films grown on W(110)

    NASA Astrophysics Data System (ADS)

    Calloni, A.; Bussetti, G.; Berti, G.; Yivlialin, R.; Camera, A.; Finazzi, M.; Duò, L.; Ciccacci, F.

    2016-12-01

    We studied the electronic structure of thin Ni films grown on a W(110) single crystal, as a function of the Ni thickness, by means of angle-resolved photoemission and inverse photoemission spectroscopy, also with spin resolution. The results are discussed in the light of the different stages characterizing the transition from the pseudomorphic bcc to the fully relaxed fcc phase. A clear spin polarization is detected as soon as a bulk-like electronic structure is observed. In these conditions, we characterized the exchange splitting of the occupied bands at the Γbar and Mbar points of the surface Brillouin zone, providing further experimental support to previous interpretations of photoemission spectra from bulk Ni.

  19. Lithium outdiffusion in LiTi2O4 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Mesoraca, S.; Kleibeuker, J. E.; Prasad, B.; MacManus-Driscoll, J. L.; Blamire, M. G.

    2016-11-01

    We report surface chemical cation composition analysis of high quality superconducting LiTi2O4 thin films, grown epitaxially on MgAl2O4 (111) substrates by pulsed laser deposition. The superconducting transition temperature of the films was 13.8 K. Surface chemical composition is crucial for the formation of a good metal/insulator interface for integrating LiTi2O4 into full-oxide spin-filtering devices in order to minimize the formation of structural defects and increase the spin polarisation efficiency. In consideration of this, we report a detailed angle resolved x-ray photoelectron spectroscopy analysis. Results show Li segregation at the surface of LiTi2O4 films. We attribute this process due to outdiffusion of Li toward the outermost LiTi2O4 layers.

  20. Preparation and rapid thermal annealing of AlN thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Liu, B.; Gao, J.; Wu, K. M.; Liu, C.

    2009-05-01

    AlN films were grown at 785 ∘C on (0001) sapphire substrates by radio-frequency assisted molecular beam epitaxy. Post-growth rapid thermal annealing (RTA) was carried out from 900 to 1200 ∘C for 10 s in flowing N 2. The morphological and structural properties of the AlN epilayers before and after the RTA were studied by atomic force microscopy, x-ray diffraction and transmission electron microscopy. It is found that the threading dislocations can be decreased to an order of magnitude by using an interlayer growth method. The surface roughness (RMS) of the AlN thin films becomes larger with the increase of annealing temperature. The full width at half maximum of AlN (0002) rocking curve reaches its minimum after the RTA at 1000 ∘C.

  1. As-grown enhancement of spinodal decomposition in spinel cobalt ferrite thin films by Dynamic Aurora pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Debnath, Nipa; Kawaguchi, Takahiko; Kumasaka, Wataru; Das, Harinarayan; Shinozaki, Kazuo; Sakamoto, Naonori; Suzuki, Hisao; Wakiya, Naoki

    2017-06-01

    Cobalt ferrite CoxFe3-xO4 thin films with composition within the miscibility gap were grown using Dynamic Aurora pulsed laser deposition. X-ray diffraction patterns reveal as-grown phase separation to Fe-rich and Co-rich phases with no post-deposition annealing. The interconnected surface microstructure of thin film shows that this phase separation occurs through spinodal decomposition enhanced by magnetic-field-induced ion-impingement. The lattice parameter variation of the thin films with the magnetic field indicates that the composition fluctuations can be enhanced further by increasing the magnetic field. Results show that spinodal decomposition enhancement by magnetic-field-induced ion-impingement is independent of the lattice-mismatch-induced strain. This approach can promote spinodal decomposition in any thin film with no post-deposition annealing process.

  2. Influence of solution viscosity on hydrothermally grown ZnO thin films for DSSC applications

    NASA Astrophysics Data System (ADS)

    Marimuthu, T.; Anandhan, N.; Thangamuthu, R.; Surya, S.

    2016-10-01

    Zinc oxide (ZnO) nanowire arrays (NWAs) were grown onto zinc oxide-titanium dioxide (ZnO-TiO2) seeded fluorine doped tin oxide (FTO) conductive substrate by hydrothermal technique. X-ray diffraction (XRD) patterns depict that ZnO thin films are preferentially oriented along the (002) plane with hexagonal wurtzite structure. Viscosity measurements reveal that viscosity of the solutions linearly increases as the concentrations of the polyvinyl alcohol (PVA) increase in the growth solution. Field emission scanning electron microscope (FE-SEM) images show that the NWAs are vertically grown to seeded FTO substrate with hexagonal structure, and the growth of NWAs decreases as the concentration of the PVA increases. Stylus profilometer and atomic force microscopic (AFM) studies predict that the thickness and roughness of the films decrease with increasing the PVA concentrations. The NWAs prepared at 0.1% of PVA exhibits a lower transmittance and higher absorbance than that of the other films. The band gap of the optimized films prepared at 0.0 and 0.1% of PVA is found to be 3.270 and 3.268 eV, respectively. The photo to current conversion efficiency of the DSSC based on photoanodes prepared at 0.0 and 0.1% of PVA exhibits about 0.64 and 0.82%, respectively. Electrochemical impedance spectra reveal that the DSSC based on photoanode prepared at 0.1% of PVA has the highest charge transfer recombination resistance.

  3. Martensite transformations in Mn2NiGa thin films grown on GaAs substrates

    NASA Astrophysics Data System (ADS)

    Schaefer, D. M.; Neckel, I. T.; Mazzaro, I.; Graff, I. L.; Varalda, J.; Schreiner, W. H.; Mosca, D. H.

    2016-11-01

    The purpose of this work is to investigate the correlation between magnetism and crystallographic structures of Mn2NiGa thin films grown by molecular beam epitaxy on GaAs(1 1 1) and GaAs(0 0 1) surfaces. The films present themselves with thermoelastic martensitic transformations upon cooling, and heating with high-temperature leads to austenite structures exhibiting a preferable (1 1 0) texture. X-ray diffraction measurements performed as a function of temperature reveal three different types of domain variants in the films within a large interval of temperatures. The austenite structures with lattice parameters ranging from 0.574 nm to 0.601 nm undergo volume conserving structural transitions to martensite with a c/a ratio of 1.2. The coexistence of variants with different domain configurations is induced on each GaAs substrate. Although the Curie temperatures (~360 K) are similar for films grown on GaAs(1 1 1) and GaAs (0 0 1) substrates, their saturation magnetizations are respectively 18 kA m-1 and 8 kA m-1 at room temperature and exhibit quite different magnetic irreversibility behaviors. Our results indicate that a multiplicity of possible equivalent variant domains on the GaAs surfaces makes it difficult to stabilize epitaxial films on these substrates.

  4. Effects of Growth Temperature on Epitaxial Thin Films of Vanadium Dioxide Grown by Pulsed Laser Deposition

    SciTech Connect

    Nag, Joyeeta; HaglundJr., Richard F; Payzant, E Andrew

    2011-01-01

    Stoichiometric vanadium dioxide in all of its bulk, thin film and nanostructured forms exhibits an insulator-to-metal transition (IMT) accompanied by structural change, induced by various physical and chemical stimuli such as temperature, ultrashort light pulses, electric field, doping or strain. In these applications, the optical qualities of the films are of paramount importance, but are often highly variable depending on fabrication procedure. We have grown epitaxial films of vanadium dioxide on c-plane (0001) of sapphire using two different procedures involving room temperature growth followed by annealing and direct high temperature growth. Strain at the interface of the substrate and the film due to growth at different temperatures leads to significant differences in morphologies and phase transition characteristics. We present a comparative study of the morphologies and switching characteristics of the two films and conclude that contrary to conventional wisdom, the room-temperature grown films have smoother, more continuous morphologies and better switching performance. Our observation is supported by theoretical and experimental studies of epitaxial growth of semiconductors.

  5. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    NASA Astrophysics Data System (ADS)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  6. Highly Crystalline CVD-grown Multilayer MoSe2 Thin Film Transistor for Fast Photodetector

    PubMed Central

    Jung, Chulseung; Kim, Seung Min; Moon, Hyunseong; Han, Gyuchull; Kwon, Junyeon; Hong, Young Ki; Omkaram, Inturu; Yoon, Youngki; Kim, Sunkook; Park, Jozeph

    2015-01-01

    Hexagonal molybdenum diselenide (MoSe2) multilayers were grown by chemical vapor deposition (CVD). A relatively high pressure (>760 Torr) was used during the CVD growth to achieve multilayers by creating multiple nuclei based on the two-dimensional crystal growth model. Our CVD-grown multilayer MoSe2 thin-film transistors (TFTs) show p-type-dominant ambipolar behaviors, which are attributed to the formation of Se vacancies generated at the decomposition temperature (650 °C) after the CVD growth for 10 min. Our MoSe2 TFT with a reasonably high field-effect mobility (10 cm2/V · s) exhibits a high photoresponsivity (93.7 A/W) and a fast photoresponse time (τrise ~ 0.4 s) under the illumination of light, which demonstrates the practical feasibility of multilayer MoSe2 TFTs for photodetector applications. PMID:26477744

  7. Preparation and characterization of epitaxially grown unsupported yttria-stabilized zirconia (YSZ) thin films

    NASA Astrophysics Data System (ADS)

    Götsch, Thomas; Mayr, Lukas; Stöger-Pollach, Michael; Klötzer, Bernhard; Penner, Simon

    2015-03-01

    Epitaxially grown, chemically homogeneous yttria-stabilized zirconia thin films ("YSZ", 8 mol% Y2O3) are prepared by direct-current sputtering onto a single-crystalline NaCl(0 0 1) template at substrate temperatures ≥493 K, resulting in unsupported YSZ films after floating off NaCl in water. A combined methodological approach by dedicated (surface science) analytical characterization tools (transmission electron microscopy and diffraction, atomic force microscopy, angle-resolved X-ray photoelectron spectroscopy) reveals that the film grows mainly in a [0 0 1] zone axis and no Y-enrichment in surface or bulk regions takes place. In fact, the Y-content of the sputter target is preserved in the thin films. Analysis of the plasmon region in EEL spectra indicates a defective nature of the as-deposited films, which can be suppressed by post-deposition oxidation at 1073 K. This, however, induces considerable sintering, as deduced from surface morphology measurements by AFM. In due course, the so-prepared unsupported YSZ films might act as well-defined model systems also for technological applications.

  8. On the microstructure of thin films grown by an isotropically directed deposition flux

    SciTech Connect

    Alvarez, R.; Romero-Gomez, P.; Gil-Rostra, J.; Yubero, F.; Palmero, A.; Gonzalez-Elipe, A. R.; Cotrino, J.

    2010-09-15

    The influence of isotropically directed deposition flux on the formation of the thin film microstructure at low temperatures is studied. For this purpose we have deposited TiO{sub 2} thin films by two different deposition techniques: reactive magnetron sputtering, in two different experimental configurations, and plasma enhanced chemical vapor deposition. The obtained results indicate that films grown under conditions where deposition particles do not possess a clear directionality, and in the absence of a relevant plasma/film interaction, present similar refractive indices no matter the deposition technique employed. The film morphology is also similar and consists of a granular surface topography and a columnarlike structure in the bulk whose diameter increases almost linearly with the film thickness. The deposition has been simulated by means of a Monte Carlo model, taking into account the main processes during growth. The agreement between simulations and experimental results indicates that the obtained microstructures are a consequence of the incorporation of low-energy, isotropically directed, deposition particles.

  9. Growth Parameters for Thin Film InBi Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Keen, B.; Makin, R.; Stampe, P. A.; Kennedy, R. J.; Sallis, S.; Piper, L. J.; McCombe, B.; Durbin, S. M.

    2014-04-01

    The alloying of bismuth with III-V semiconductors, in particular GaAs and InAs thin films grown by molecular beam epitaxy (MBE), has attracted considerable interest due to the accompanying changes in band structure and lattice constant. Specifically, bismuth incorporation in these compounds results in both a reduction in band gap (through shifting of the valence band) and an increase in the lattice constant of the alloy. To fully understand the composition of these alloys, a better understanding of the binary endpoints is needed. At present, a limited amount of literature exists on the III-Bi family of materials, most of which is theoretical work based on density functional theory calculations. The only III-Bi material known to exist (in bulk crystal form) is InBi, but its electrical properties have not been sufficiently studied and, to date, the material has not been fabricated as a thin film. We have successfully deposited crystalline InBi on (100) GaAs substrates using MBE. Wetting of the substrate is poor, and regions of varying composition exist across the substrate. To obtain InBi, the growth temperature had to be below 100 °C. It was found that film crystallinity improved with reduced Bi flux, into an In-rich regime. Additionally, attempts were made to grow AlBi and GaBi.

  10. A kinetic model for stress generation in thin films grown from energetic vapor fluxes

    SciTech Connect

    Chason, E.; Karlson, M.; Colin, J. J.; Abadias, G.; Magnfält, D.; Sarakinos, K.

    2016-04-14

    We have developed a kinetic model for residual stress generation in thin films grown from energetic vapor fluxes, encountered, e.g., during sputter deposition. The new analytical model considers sub-surface point defects created by atomic peening, along with processes treated in already existing stress models for non-energetic deposition, i.e., thermally activated diffusion processes at the surface and the grain boundary. According to the new model, ballistically induced sub-surface defects can get incorporated as excess atoms at the grain boundary, remain trapped in the bulk, or annihilate at the free surface, resulting in a complex dependence of the steady-state stress on the grain size, the growth rate, as well as the energetics of the incoming particle flux. We compare calculations from the model with in situ stress measurements performed on a series of Mo films sputter-deposited at different conditions and having different grain sizes. The model is able to reproduce the observed increase of compressive stress with increasing growth rate, behavior that is the opposite of what is typically seen under non-energetic growth conditions. On a grander scale, this study is a step towards obtaining a comprehensive understanding of stress generation and evolution in vapor deposited polycrystalline thin films.

  11. Phase and disorder investigations in boron nitride thin films grown by PECVD

    SciTech Connect

    Depero, L.E.; Sangaletti, L.; Schaffnit, C.; Rossi, F.; Gibson, P.N.

    1996-12-31

    Based on X-ray diffraction and infrared spectroscopy measurements, BN thin films grown by PECVD on silicon substrates have been studied with the aim of identifying the thin film phase. In a set of samples, while the infrared spectra showed characteristic bands of the hexagonal phase, X-ray diffraction patterns only displayed reflections belonging to the cubic BN phase. Therefore, structural models have been developed to explain the apparent inconsistency between the two sets of experimental data. In particular, static disorder effects--which have been introduced in the model starting from the sp{sup 2} hybridization of the ordered hexagonal phase, as suggested by the infra-red spectroscopy results--allowed a consistent interpretation of the X-ray diffraction patterns. For another set of samples, which also showed a characteristic hexagonal signal in the IR data, the XRD pattern could not be indexed with any of the BN phases. In this case, the presence of molecular and ionic phases, associated with impurities, was considered in structural modeling studies.

  12. Electrochromism and photocatalysis in dendrite structured Ti:WO3 thin films grown by sputtering

    NASA Astrophysics Data System (ADS)

    Karuppasamy, A.

    2015-12-01

    Titanium doped tungsten oxide (Ti:WO3) thin films with dendrite surface structures were grown by co-sputtering titanium and tungsten in Ar + O2 atmosphere. Ti:WO3 thin films were deposited at oxygen flow rates corresponding to pressures in the range 1.0 × 10-3-5.0 × 10-3 mbar. Argon flow rate and sputtering power densities for titanium (2 W/cm2) and tungsten (3 W/cm2) were kept constant. Ti:WO3 films deposited at an oxygen pressure of 5 × 10-3 mbar are found to be better electrochromic and photocatalytic. They have high optical modulation (80% at λ = 550 nm), coloration efficiency (60 cm2/C at λ = 550 nm), electron/ion storage and removal capacity (Qc: -22.01 mC/cm2, Qa: 17.72 mC/cm2), reversibility (80%) and methylene blue decomposition rate (-1.38 μmol/l d). The combined effects of titanium doping, dendrite surface structures and porosity leads to significant enhancement in the electrochromic and photocatalytic properties of Ti:WO3 films.

  13. Direct synthesis of porous NiO nanowall arrays on conductive substrates for supercapacitor application

    SciTech Connect

    Zhu, Jianhui; Jiang, Jian; Liu, Jingping; Ding, Ruimin; Ding, Hao; Feng, Yamin; Wei, Guangming; Huang, Xintang

    2011-03-15

    Porous NiO nanowall arrays (NWAs) grown on flexible Fe-Co-Ni alloy have been successfully synthesized by using nullaginite (Ni{sub 2}(OH){sub 2}CO{sub 3}) as precursor and investigated as supercapacitor electrodes. In details, we adopted a simple hydrothermal method to realize Ni{sub 2}(OH){sub 2}CO{sub 3} NWAs and examined their robust mechanical adhesion to substrate via a long-time ultrasonication test. Porous NiO NWAs were then obtained by a post-calcination towards precursors at 500 {sup o}C in nitrogen atmosphere. Electrochemical properties of as-synthesized NiO NWAs were evaluated by cyclic voltammetry and galvanostatic charge/discharge; porous NiO NWAs electrode delivered a specific capacitance of 270 F/g (0.67 A/g); even at high current densities, the electrode could still deliver a high capacitance up to 236 F/g (13.35 A/g). Meanwhile, it exhibited excellent cycle lifetime with {approx}93% specific capacitance kept after 4000 cycles. These results suggest that as-made porous NiO NWAs electrode is a promising candidate for future thin-film supercapacitors and other microelectronic systems. -- Graphical abstract: Porous NiO nanowall arrays (NWAs) grown on alloy substrate have been made using nullaginite as precursor and studied as supercapacitor electrodes. Porous nanowalls interconnected with each other resulting in the formation of extended-network architectures and exhibited excellent capacitor properties. NiO NWAs electrode delivered a capacitance of 270 F/g (0.67 A/g); even at high current density, the electrode could still deliver a high capacitance up to 236 F/g (13.35 A/g). Besides, it exhibited excellent cycle lifetime with {approx}93% capacitance kept after 4000 cycles. These remarkable results made it possible for mass production of NiO NWAs and future thin-film microelectronic applications. Display Omitted Research highlights: {yields} Large-scale nullaginite (Ni{sub 2}(OH){sub 2}CO{sub 3}) nanowall arrays (NWAs) have been synthesized on

  14. Optical and electrical properties of Titania thin films doped with In3+ and grown by sol-gel process.

    NASA Astrophysics Data System (ADS)

    Rodolfo Palomino Merino, Martín; Lozada Morales, Rosendo; Xoxocotzi Aguilar, Reyna; Díaz Furlong, Alfonso

    2004-03-01

    Using the sol-gel process were prepared Titania (TiO2) thin films formed on glass substrates by dip-coating method. The samples were grown starting from Titanium Isopropoxide and changing the concentration of In3+ ions from Indium Nitrate. The results of the characterization of the samples by UV-VIS spectroscopy , IR , thermopotency and conductivity will be reported.

  15. The temperature dependence of the electrical conductivity in Cu2O thin films grown by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Kudryashov, D.; Gudovskikh, A.; Zelentsov, K.; Mozharov, A.; Babichev, A.; Filimonov, A.

    2016-08-01

    The temperature dependence of the electrical conductivity in Cu2O thin films grown by magnetron sputtering at room temperature under different rf-power was investigated. Calculated activation energy of the conductivity for copper oxide (I) films linearly increases with increase in sputtering power reflecting an increasing in concentration of gap states.

  16. Thermoelectric properties of epitaxial β-FeSi2 thin films grown on Si(111) substrates with various film qualities

    NASA Astrophysics Data System (ADS)

    Watanabe, Kentaro; Taniguchi, Tatsuhiko; Sakane, Shunya; Aoki, Shunsuke; Suzuki, Takeyuki; Fujita, Takeshi; Nakamura, Yoshiaki

    2017-05-01

    Si-based epitaxial β-FeSi2 thin films are attractive as materials for on-chip thermoelectric power generators. We investigated the structure, crystallinity, and thermoelectric properties of β-FeSi2 thin films epitaxially grown on Si(111) substrates by using three different techniques: conventional reactive deposition epitaxy followed by molecular beam epitaxy (RDE+MBE), solid phase epitaxy (SPE) based on codeposition of Fe and Si presented previously, and SPE followed by MBE (SPE+MBE) presented newly by this work. Their epitaxial growth temperatures were fixed at 530 °C for comparison. RDE+MBE thin films exhibited high crystalline quality, but rough surfaces and rugged β-FeSi2/Si(111) interfaces. On the other hand, SPE thin films showed flat surfaces and abrupt β-FeSi2/Si(111) interfaces but low crystallinity. We found that SPE+MBE thin films realized crystallinity higher than SPE thin films, and also had flatter surfaces and sharper interfaces than RDE+MBE thin films. In SPE+MBE thin film growth, due to the initial SPE process with low temperature codeposition, thermal interdiffusion of Fe and Si was suppressed, resulting in the surface flatness and abrupt interface. Second high temperature MBE process improved the crystallinity. We also investigated thermoelectric properties of these β-FeSi2 thin films. Structural factors affecting the thermoelectric properties of RDE+MBE, SPE, and SPE+MBE thin films were investigated.

  17. The frequency-dependent AC photoresistance behavior of ZnO thin films grown on different sapphire substrates.

    PubMed

    Cholula-Díaz, Jorge L; Barzola-Quiquia, José; Videa, Marcelo; Yin, Chunhai; Esquinazi, Pablo

    2017-09-13

    Zinc oxide (ZnO) thin films were grown by pulsed layer deposition under an N2 atmosphere at low pressures on a- and r-plane sapphire substrates. Structural studies using X-ray diffraction confirmed that all films had a wurtzite phase. ZnO thin films on a- and r-plane sapphire have grown with orientations along the [0002] and [112[combining macron]0] directions, respectively. Room temperature photoluminescence measurements indicate that the presence of native point defects (interstitial zinc, oxygen vacancies, oxygen antisites and zinc vacancies) is more preponderant for ZnO thin films grown on the r-plane sapphire substrate than the sample grown on the a-plane sapphire substrate. Room temperature impedance spectroscopy measurements were performed in an alternating current frequency range from 40 to 10(5) Hz in the dark and under normal light. An unusual positive photoresistance effect is observed at frequencies above 100 kHz, which we suggest to be due to intrinsic defects present in the ZnO thin films. Furthermore, an analysis of the optical time response revealed that the film grown on the r-plane sapphire substrate responds faster (characteristic relaxation times for τ1, τ2 and τ3 of 0.05, 0.26 and 6.00 min, respectively) than the film grown on the a-plane sapphire substrate (characteristic relaxation times for τ1, τ2 and τ3 of 0.10, 0.73 and 4.02 min, respectively).

  18. Epitaxial CuInSe2 thin films grown by molecular beam epitaxy and migration enhanced epitaxy

    NASA Astrophysics Data System (ADS)

    Abderrafi, K.; Ribeiro-Andrade, R.; Nicoara, N.; Cerqueira, M. F.; Gonzalez Debs, M.; Limborço, H.; Salomé, P. M. P.; Gonzalez, J. C.; Briones, F.; Garcia, J. M.; Sadewasser, S.

    2017-10-01

    While CuInSe2 chalcopyrite materials are mainly used in their polycrystalline form to prepare thin film solar cells, epitaxial layers have been used for the characterization of defects. Typically, epitaxial layers are grown by metal-organic vapor phase epitaxy or molecular beam epitaxy (MBE). Here we present epitaxial layers grown by migration enhanced epitaxy (MEE) and compare the materials quality to MBE grown layers. CuInSe2 layers were grown on GaAs (0 0 1) substrates by co-evaporation of Cu, In, and Se using substrate temperatures of 450 °C, 530 °C, and 620 °C. The layers were characterized by high resolution X-ray diffraction (HR-XRD), high-resolution transmission electron microscopy (HRTEM), Raman spectroscopy, and atomic force microscopy (AFM). HR-XRD and HR-TEM show a better crystalline quality of the MEE grown layers, and Raman scattering measurements confirm single phase CuInSe2. AFM shows the previously observed faceting of the (0 0 1) surface into {1 1 2} facets with trenches formed along the [1 1 0] direction. The surface of MEE-grown samples appears smoother compared to MBE-grown samples, a similar trend is observed with increasing growth temperature.

  19. Structural and chemical characterization of terbia thin films grown on hexagonally close packed metal substrates

    NASA Astrophysics Data System (ADS)

    Cartas, William

    Rare earth oxides (REOs) exhibit favorable catalytic performance for a diverse set of chemical transformations, including both partial and complete oxidation reactions. I will discuss our efforts to develop thin film systems of terbia for model surface science investigations of a REO that is effectively reducible, and which is thus expected to promote complete oxidation chemistry of adsorbed species. The growth of terbia on Cu(111) is shown to produce a complex surface that exhibits multiple phases of the oxide as well as exposed substrate. Growing the film on Pt(111) results in more uniform, single phase, and closed film. We used low energy electron diffraction (LEED) and scanning tunneling microscopy (STM) to characterize the structural properties of terbia thin films grown on Pt(111) in ultrahigh vacuum (UHV) using physical vapor deposition. We find that the REO grows as a high quality Tb2O 3(111) film, and adopts oxygen-deficient fluorite structures wherein the metal cations form a hexagonal lattice in registry with the Pt(111) substrate, while oxygen vacancies are randomly distributed within the film. The Tb 2O3(111) films are thermally stable when heated to 1000 K in UHV. LEED and STM show that a fraction of the Tb2O3 forms hexagonal islands when first deposited, and further depositions typically result in three dimensional growth of the film. The Tb2O3 (111) / Pt(111) system produces a coincidence structure, seen very clearly in LEED images. We have also found that Tb2O3(111) films can be oxidized in UHV by exposure to plasma-generated atomic oxygen beams. The oxidized films have an estimated TbO2 stoichiometry and decompose to Tb2O3 during heating, with O2 desorption starting at about 500 K. Terbia films oxidized at 90 K show a weakly bound state of oxygen that is likely chemisorbed. Temperature programmed reaction spectroscopy (TPRS) studies using methanol show that increased oxygen in the film does not modify the chemical selectivity of the film; however

  20. Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

    SciTech Connect

    Gupta, S.; Katiyar, R. S.; Gilbert, D. R.; Singh, R. K.; Morell, G.

    2000-11-15

    A detailed investigation of the correlation among intrinsic stress ({sigma}{sub int}), nonuniform stress ({sigma}{sub nu}), and phonon lifetime (1/{Gamma}) was performed in order to obtain a coherent and comprehensive picture of the microstructure of diamond thin films grown by the electron cyclotron resonance-assisted chemical vapor deposition (ECR-CVD) technique. It was found that the diamond growth taking place by the ECR-CVD is different to that taking place by the microwave CVD and hot-filament CVD. Point and line defects, rather than sp{sup 2} C bonds, were found to be the dominant source of both nonuniform stress and reduced phonon lifetime. The surface relaxation mechanism in these films yields sp{sup 2} C at the expense of strained sp{sup 3} C, resulting in a trade off between diamond yield and crystalline quality. The diamond precursor that spontaneously forms on the unseeded substrates yielded higher quality diamond than planted diamond seeds. The grain boundary relaxation model proposed by Hoffman accounts well for the observed behavior of the intrinsic stress, thus indicating that microstructural restructuration takes place at the grain boundaries when sufficient time and thermal energy are provided.

  1. Comparative study of ITO and FTO thin films grown by spray pyrolysis

    SciTech Connect

    Ait Aouaj, M.; Diaz, R.; Belayachi, A.; Rueda, F.; Abd-Lefdil, M.

    2009-07-01

    Tin doped indium oxide (ITO) and fluorine doped tin oxide (FTO) thin films have been prepared by one step spray pyrolysis. Both film types grown at 400 deg. C present a single phase, ITO has cubic structure and preferred orientation (4 0 0) while FTO exhibits a tetragonal structure. Scanning electron micrographs showed homogeneous surfaces with average grain size around 257 and 190 nm for ITO and FTO respectively. The optical properties have been studied in several ITO and FTO samples by transmittance and reflectance measurements. The transmittance in the visible zone is higher in ITO than in FTO layers with a comparable thickness, while the reflectance in the infrared zone is higher in FTO in comparison with ITO. The best electrical resistivity values, deduced from optical measurements, were 8 x 10{sup -4} and 6 x 10{sup -4} {Omega} cm for ITO (6% of Sn) and FTO (2.5% of F) respectively. The figure of merit reached a maximum value of 2.15 x 10{sup -3} {Omega}{sup -1} for ITO higher than 0.55 x 10{sup -3} {Omega}{sup -1} for FTO.

  2. Neutron Depth Profiling (NDP) of boron thin films in epitaxially grown silicon

    NASA Astrophysics Data System (ADS)

    Chen-Mayer, H. Heather; Lamaze, George P.; Simons, David S.

    2001-03-01

    Neutron Depth Profiling is a technique for the determination of concentration and distribution of certain light elements in the region of about 1 µm below a solid surface. An incident neutron beam activates the nucleus of interest and causes the emission of reaction products in the form of charged particles which carry information of the reaction origin. The eligible elements include boron, lithium, and nitrogen. The most common substrate measured at NIST is silicon. We have studied a calibration sample for the purpose of inter-comparison between NDP and SIMS. The sample is a multilayer consisting of a 1 µm-thick epitaxially grown silicon film with four thin layers of boron about 0.25 micrometers apart. A previous study on the mathematical modeling of the NDP data indicates a discrepancy between the NDP and the SIMS data, either due to the uncertainty of the density of the film or of the stopping power of the alpha particle in silicon. The density has been verified by x-ray reflectivity to be that of the bulk. To understand this discrepancy, we have measured the angular dependence of the charged-particle emission which provides an experimentally determined relation between the energy loss and the depth. The result is compared with the stopping power obtained from TRIM to determine whether the discrepancy can be resolved with a modified stopping power.

  3. Growth and characterization of polymer thin films grown using molecular layer deposition with heterobifunctional precursors

    NASA Astrophysics Data System (ADS)

    Gibbs, Zachary Michael Conway

    In this work, growth of thin polymer films using molecular layer deposition with heterobifunctional precursors is investigated. Several growth phenomena are observed including: loss or gain of reactive sites as a result of precursor reactivity or vapor pressure; precursor diffusion and reaction within the porous polymer film; and crosslinking. Reactions were investigated using quartz crystal microbalance, Fourier transform infrared spectroscopy, and various ex situ techniques. Reactions involving 4-azidophenylisothiocyanate and 4-aminobenzonitrile were shown to stop growth after only a few cycles which is attributed to a loss in reactive sites which was modeled by an exponentially decaying growth rate. Growth of 4-carboxyphenylisothiocyanate with TMA and water was investigated as well. Active site multiplication as a result of the trifunctionality of the TMA molecule was proposed to explain the significantly higher growth rate for TMA/CI films. TMA/H2O/CI films showed the ability to crosslink through aluminum hydroxyl condensation reactions. Upon increasing the reaction temperature, reactant diffusion was observed in the form of mass removal upon TMA exposure. This same phenomena is thought to be occurring in films grown using Diels-Alder reactions in the third section of this thesis. These films showed a strong growth rate dependence upon reactant purge time and growth temperature. FTIR seems to weakly support Diels-Alder reaction, but it appears that the primary film growth mechanism is through CVD-like diffusion and condensation reactions.

  4. Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Gupta, S.; Katiyar, R. S.; Gilbert, D. R.; Singh, R. K.; Morell, G.

    2000-11-01

    A detailed investigation of the correlation among intrinsic stress (σint), nonuniform stress (σnu), and phonon lifetime (1/Γ) was performed in order to obtain a coherent and comprehensive picture of the microstructure of diamond thin films grown by the electron cyclotron resonance-assisted chemical vapor deposition (ECR-CVD) technique. It was found that the diamond growth taking place by the ECR-CVD is different to that taking place by the microwave CVD and hot-filament CVD. Point and line defects, rather than sp2 C bonds, were found to be the dominant source of both nonuniform stress and reduced phonon lifetime. The surface relaxation mechanism in these films yields sp2 C at the expense of strained sp3 C, resulting in a trade off between diamond yield and crystalline quality. The diamond precursor that spontaneously forms on the unseeded substrates yielded higher quality diamond than planted diamond seeds. The grain boundary relaxation model proposed by Hoffman accounts well for the observed behavior of the intrinsic stress, thus indicating that microstructural restructuration takes place at the grain boundaries when sufficient time and thermal energy are provided.

  5. Dynamics of surface evolution in semiconductor thin films grown from a chemical bath

    PubMed Central

    Gupta, Indu; Mohanty, Bhaskar Chandra

    2016-01-01

    Dynamics of surface evolution in CdS thin films grown by chemical bath deposition technique has been studied from time sequence of atomic force micrographs. Detailed scaling analysis of surface fluctuation in real and Fourier space yielded characteristic exponents αloc = 0.78 ± 0.07, α = 2.20 ± 0.08, αs = 1.49 ± 0.22, β = 0.86 ± 0.05 and βloc = 0.43 ± 0.10, which are very different from those predicted by the local growth models and are not related to any known universality classes. The observed anomalous scaling pattern, characterized by power law scaling dependence of interface width on deposition time differently at local and global scale, with rapid roughening of the growth front has been discussed to arise as a consequence of a nonlocal effect in the form of diffusional instability. PMID:27615367

  6. Photoinduced Br Desorption from CsBr Thin Films Grown on Cu(100)

    SciTech Connect

    Halliday, Matthew T.; Joly, Alan G.; Hess, Wayne P.; Shluger, AL

    2015-10-22

    Thin films of CsBr deposited onto metals such as copper are potential photocathode materials for light sources and other applications. We investigate desorption dynamics of Br atoms from CsBr films grown on insulator (KBr, LiF) and metal (Cu) substrates induced by sub-bandgap 6.4 eV laser pulses. The experimental results demonstrate that the peak kinetic energy of Br atoms desorbed from CsBr/Cu films is much lower than that for the hyperthermal desorption from CsBr/LiF films. Kelvin probe measurements indicate negative charge at the surface following Br desorption from CsBr/Cu films. Our ab initio calculations of excitons at CsBr surfaces demonstrate that this behavior can be explained by an exciton model of desorption including electron trapping at the CsBr surface. Trapped negative charges reduce the energy of surface excitons available for Br desorption. We examine the electron-trapping characteristics of low-coordinated sites at the surface, in particular, divacancies and kink sites. We also provide a model of cation desorption caused by Franck-Hertz excitation of F centers at the surface in the course of irradiation of CsBr/Cu films. These results provide new insights into the mechanisms of photoinduced structural evolution of alkali halide films on metal substrates and activation of metal photocathodes coated with CsBr.

  7. Reproducibility and off-stoichiometry issues in nickelate thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Preziosi, Daniele; Sander, Anke; Barthélémy, Agnès; Bibes, Manuel

    2017-01-01

    Rare-earth nickelates are strongly correlated oxides displaying a metal-to-insulator transition at a temperature tunable by the rare-earth ionic radius. In PrNiO3 and NdNiO3, the transition is very sharp and shows an hysteretic behavior akin to a first-order transition. Both the temperature at which the transition occurs and the associated resistivity change are extremely sensitive to doping and therefore to off-stoichiometry issues that may arise during thin film growth. Here we report that strong deviations in the transport properties of NdNiO3 films can arise in films grown consecutively under nominally identical conditions by pulsed laser deposition; some samples show a well-developed transition with a resistivity change of up to five orders of magnitude while others are metallic down to low temperatures. Through a detailed analysis of in-situ X-ray photoelectron spectroscopy data, we relate this behavior to large levels of cationic off-stoichoimetry that also translate in changes in the Ni valence and bandwidth. Finally, we demonstrate that this lack of reproducibility can be remarkably alleviated by using single-phase NdNiO3 targets.

  8. Transparent conductive Al-doped ZnO thin films grown at room temperature

    SciTech Connect

    Wang Yuping; Lu Jianguo; Bie Xun; Gong Li; Li Xiang; Song Da; Zhao Xuyang; Ye Wenyi; Ye Zhizhen

    2011-05-15

    Aluminum-doped ZnO (ZnO:Al, AZO) thin films were prepared on glass substrates by dc reactive magnetron sputtering from a Zn-Al alloy target at room temperature. The effects of the Ar-to-O{sub 2} partial pressure ratios on the structural, electrical, and optical properties of AZO films were studied in detail. AZO films grown using 100:4 to 100:8 Ar-to-O{sub 2} ratio result in acceptable quality films with c-axis orientated crystals, uniform grains, 10{sup -3} {Omega} cm resistivity, greater than 10{sup 20} cm{sup -3} electron concentration, and high transmittance, 90%, in the visible region. The lowest resistivity of 4.11x10{sup -3} {Omega} cm was obtained under the Ar-to-O{sub 2} partial pressure ratio of 100:4. A relatively strong UV emission at {approx}3.26 eV was observed in the room-temperature photoluminescence spectrum. X-ray photoelectron spectroscopy analysis confirmed that Al was introduced into ZnO and substitutes for Zn and doped the film n-type.

  9. Control of native acceptor density in epitaxial Cu2O thin films grown by electrochemical deposition

    NASA Astrophysics Data System (ADS)

    Ashida, Atsushi; Sato, Shunsuke; Yoshimura, Takeshi; Fujimura, Norifumi

    2017-06-01

    Controlling the native carrier is essential for using Cu2O in devices such as solar cells. The origin of the native p-type carrier in Cu2O is thought to be copper vacancies (VCu). In this work, epitaxially grown Cu2O thin films were prepared by electrochemical deposition at a low temperature of 45 °C on a Pt (111) cathodic electrode. The sources of Cu and O for Cu2O were Cu2+ and OH- in the electrolyte and the ion concentrations were changed to control the stoichiometry of deposition and the density of VCu. The density of ionized acceptors (NA+) in the Cu2O films was evaluated by the C-V properties measured with Schottky electrodes. NA+ did not depend on [Cu2+], whereas NA+ increased with increasing [OH-] when [OH-] was larger than 10-3 mol/L (electrolyte pH >11) with [Cu2+] fixed at 10-1 mol/L. The ion concentration dependence of NA+ and the dependence of the total cathodic current density revealed that the generation of VCu was affected by a complex combination of the ion concentrations and film growth rate.

  10. STM study of the Ga thin films grown on Si(111) surface

    NASA Astrophysics Data System (ADS)

    Tao, Min-Long; Tu, Yu-Bing; Sun, Kai; Ye, Juan; Hao, Shao-Jie; Xiao, Hua-Fang; Wang, Ya-Li; Xie, Zheng-Bo; Wang, Jun-Zhong

    2017-09-01

    Structural evolution of Ga thin films grown on the Si(111)-√{ 3 } × √{ 3 } -Ga template have been investigated with a low-temperature scanning tunneling microscopy (STM). The first Ga layer exhibits a stripe structure along the base vectors of Si(111) lattices. Individual Ga dimers have been directly visualized from the high-resolution STM images of the first Ga layer. The second Ga layer reveals a pseudo 1×1 structure with respect to the Si(111). A new 5×5 phase has been found in the second Ga layer when annealing the sample to 120 ℃. Further annealing to 150 ℃ leads to the formation of 6.3×6.3 phase, which is more stable than the 5×5 phase. The existences of a variety of superstructures of Ga films demonstrates the delicate balance between the interactions of Si(111)-Ga and Ga-Ga. These results shed important light on the epitaxial growth mechanism of Ga films on semiconductor surfaces.

  11. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire

    NASA Astrophysics Data System (ADS)

    Douglass, K.; Hunt, S.; Teplyakov, A.; Opila, R. L.

    2010-12-01

    Surface preparation procedures for indium gallium nitride (InGaN) thin films were analyzed for their effectiveness for carbon and oxide removal as well as for the resulting surface roughness. Aqua regia (3:1 mixture of concentrated hydrochloric acid and concentrated nitric acid, AR), hydrofluoric acid (HF), hydrochloric acid (HCl), piranha solution (1:1 mixture of sulfuric acid and 30% H 2O 2) and 1:9 ammonium sulfide:tert-butanol were all used along with high temperature anneals to remove surface contamination. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were utilized to study the extent of surface contamination and surface roughness, respectively. The ammonium sulfide treatment provided the best overall removal of oxygen and carbon. Annealing over 700 °C after a treatment showed an even further improvement in surface contamination removal. The piranha treatment resulted in the lowest residual carbon, while the ammonium sulfide treatment leads to the lowest residual oxygen. AFM data showed that all the treatments decreased the surface roughness (with respect to as-grown specimens) with HCl, HF, (NH 4) 2S and RCA procedures giving the best RMS values (˜0.5-0.8 nm).

  12. Magnetic and structural properties of Co2FeAl thin films grown on Si substrate

    NASA Astrophysics Data System (ADS)

    Belmeguenai, Mohamed; Tuzcuoglu, Hanife; Gabor, Mihai; Petrisor, Traian; Tiusan, Coriolan; Berling, Dominique; Zighem, Fatih; Mourad Chérif, Salim

    2015-01-01

    The correlation between magnetic and structural properties of Co2FeAl (CFA) thin films of different thicknesses (10 nmgrown at room temperature on MgO-buffered Si/SiO2 substrates and annealed at 600 °C has been studied. x-ray diffraction (XRD) measurements revealed an (011) out-of-plane textured growth of the films. The deduced lattice parameter increases with the film thickness. Moreover, pole figures showed no in-plane preferential growth orientation. The magneto-optical Kerr effect hysteresis loops showed the presence of a weak in-plane uniaxial anisotropy with a random easy axis direction. The coercive field, measured with the applied field along the easy axis direction, and the uniaxial anisotropy field increase linearly with the inverse of the CFA thickness. The microstrip line ferromagnetic resonance measurements for in-plane and perpendicular applied magnetic fields revealed that the effective magnetization and the uniaxial in-plane anisotropy field follow a linear variation versus the inverse CFA thickness. This allows deriving a perpendicular surface anisotropy coefficient of -1.86 erg/cm2.

  13. Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films grown by atomic layer deposition

    SciTech Connect

    Tamm, Aile Kozlova, Jekaterina; Aarik, Lauri; Aarik, Jaan; Kukli, Kaupo; Link, Joosep; Stern, Raivo

    2015-01-15

    Dysprosium oxide and dysprosium-oxide-doped titanium oxide thin films were grown by atomic layer deposition on silicon substrates. For depositing dysprosium and titanium oxides Dy(thd){sub 3}-O{sub 3} and TiCl{sub 4}-O{sub 3} were used as precursors combinations. Appropriate parameters for Dy(thd){sub 3}-O{sub 3} growth process were obtained by using a quartz crystal microbalance system. The Dy{sub 2}O{sub 3} films were deposited on planar substrates and on three-dimensional substrates with aspect ratio 1:20. The Dy/Ti ratio of Dy{sub 2}O{sub 3}-doped TiO{sub 2} films deposited on a planar silicon substrate ranged from 0.04 to 0.06. Magnetometry studies revealed that saturation of magnetization could not be observed in planar Dy{sub 2}O{sub 3} films, but it was observable in Dy{sub 2}O{sub 3} films on 3D substrates and in doped TiO{sub 2} films with a Dy/Ti atomic ratio of 0.06. The latter films exhibited saturation magnetization 10{sup −6} A cm{sup 2} and coercivity 11 kA/m at room temperature.

  14. CdTe thin films grown by pulsed laser deposition using powder as target: Effect of substrate temperature

    NASA Astrophysics Data System (ADS)

    de Moure-Flores, F.; Quiñones-Galván, J. G.; Guillén-Cervantes, A.; Arias-Cerón, J. S.; Hernández-Hernández, A.; Santoyo-Salazar, J.; Santos-Cruz, J.; Mayén-Hernández, S. A.; de la L. Olvera, M.; Mendoza-Álvarez, J. G.; Meléndez-Lira, M.; Contreras-Puente, G.

    2014-01-01

    CdTe thin films were deposited by pulsed laser deposition on Corning glass slides using CdTe powder as target. Films were grown at substrate temperatures ranging from room temperature (~25 °C) to 300 °C. The structural, compositional and optical properties were analyzed as a function of substrate temperature. X-ray diffraction shows that CdTe films grown at room temperature have hexagonal phase, while for higher temperatures the films have cubic phase. Raman and EDS indicate that films grew with Te excess, which suggests that CdTe films have p-type conductivity.

  15. P-doped strontium titanate grown using two target pulsed laser deposition for thin film solar cells

    NASA Astrophysics Data System (ADS)

    Man, Hamdi

    Thin-film solar cells made of Mg-doped SrTiO3 p-type absorbers are promising candidates for clean energy generation. This material shows p-type conductivity and also demonstrates reasonable absorption of light. In addition, p-type SrTiO3 can be deposited as thin films so that the cost can be lower than the competing methods. In this work, Mg-doped SrTiO3 (STO) thin-films were synthesized and analyzed in order to observe their potential to be employed as the base semiconductor in photovoltaic applications. Mg-doped STO thin-films were grown by using pulsed laser deposition (PLD) using a frequency quadrupled Yttrium Aluminum Garnet (YAG) laser and with a substrate that was heated by back surface absorption of infrared (IR) laser light. The samples were characterized using X-ray photoelectron spectroscopy (XPS) and it was observed that Mg atoms were doped successfully in the stoichiometry. Reflection high energy electron diffraction (RHEED) spectroscopy proved that the thin films were polycrystalline. Kelvin Probe work function measurements indicated that the work function of the films were 4.167 eV after annealing. UV/Vis Reflection spectroscopy showed that Mg-doped STO thin-films do not reflect significantly except in the ultraviolet region of the spectrum where the reflection percentage increased up to 80%. Self-doped STO thin-films, Indium Tin Oxide (ITO) thin films and stainless steel foil (SSF) were studied in order to observe their characteristics before employing them in Mg-doped STO based solar cells. Self-doped STO thin films were grown using PLD and the results showed that they are capable of serving as the n-type semiconductor in solar cell applications with oxygen vacancies in their structure and low reflectivity. Indium Tin Oxide thin-films grown by PLD system showed low 25-50 ?/square sheet resistance and very low reflection features. Finally, commercially available stainless steel foil substrates were excellent substrates for the inexpensive growth of

  16. Surface structure determinations of crystalline ionic thin films grown on transition metal single crystal surfaces by low energy electron diffraction

    SciTech Connect

    Roberts, Joel Glenn

    2000-05-01

    The surface structures of NaCl(100), LiF(100) and alpha-MgCl2(0001) adsorbed on various metal single crystals have been determined by low energy electron diffraction (LEED). Thin films of these salts were grown on metal substrates by exposing the heated metal surface to a molecular flux of salt emitted from a Knudsen cell. This method of investigating thin films of insulators (ionic salts) on a conducting substrate (metal) circumvents surface charging problems that plagued bulk studies, thereby allowing the use of electron-based techniques to characterize the surface.

  17. Luminescence properties of lanthanide and ytterbium lanthanide titanate thin films grown by atomic layer deposition

    SciTech Connect

    Hansen, Per-Anders Fjellvåg, Helmer; Nilsen, Ola; Finstad, Terje G.

    2016-01-15

    Lanthanide based luminescent materials are highly suitable as down conversion materials in combination with a UV-absorbing host material. The authors have used TiO{sub 2} as the UV-absorbing host material and investigated the energy transfer between TiO{sub 2} and 11 different lanthanide ions, Ln{sup 3+} (Ln = La, Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb) in thin films grown by atomic layer deposition. They have also investigated the possibility to improve the overall energy transfer from TiO{sub 2} to Yb{sup 3+} with a second Ln{sup 3+}, in order to enhance down conversion. The films were grown at a substrate temperature of 300 °C, using the Ln(thd){sub 3}/O{sub 3} (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) and TiCl{sub 4}/H{sub 2}O precursor pairs. The focus of the work is to explore the energy transfer from TiO{sub 2} to Ln{sup 3+} ions, and the energy transfer between Ln{sup 3+} and Yb{sup 3+} ions, which could lead to efficient down conversion. The samples have been characterized by x-ray diffraction, x-ray fluorescence, spectroscopic ellipsometry, and photoluminescence. All films were amorphous as deposited, and the samples have been annealed at 600, 800, and 1000 °C in order to investigate the correlation between the crystallinity and luminescence. The lanthanum titanium oxide samples showed a weak and broad emission centered at 540 nm, which was absent in all the other samples, indicating energy transfer from TiO{sub 2} to Ln{sup 3+} in all other lanthanide samples. In the amorphous phase, all samples, apart from La, Tb, and Tm, showed a typical f-f emission when excited by a 325 nm HeCd laser. None of the samples showed any luminescence after annealing at 1000 °C due to the formation of Ln{sub 2}Ti{sub 2}O{sub 7}. Samples containing Nd, Sm, and Eu show a change in emission spectrum when annealed at 800 °C compared to the as-deposited samples, indicating that the smaller lanthanides crystallize in a different manner than the larger

  18. Diamond thin films grown by microwave plasma assisted chemical vapor deposition

    SciTech Connect

    Leksono, M.

    1991-09-05

    Undoped and boron doped diamond thin films have been successfully grown by microwave plasma chemical vapor deposition from CH{sub 4}, H{sub 2}, and B{sub 2}H{sub 6}. The films were characterized using x- ray diffraction techniques, Raman and infrared spectroscopies, scanning electron microscopy, secondary ion mass spectrometry, and various electrical measurements. The deposition rates of the diamond films were found to increase with the CH{sub 4} concentration, substrate temperature, and/or pressure, and at 1.0% methane, 900{degrees}C, and 35 Torr, the value was measured to be 0.87 {mu}m/hour. The deposition rate for boron doped diamond films, decreases as the diborane concentration increases. The morphologies of the undoped diamond films are strongly related to the deposition parameters. As the temperature increases from 840 to 925 C, the film morphology changes from cubo-octahedron to cubic structures, while as the CH{sub 4} concentration increases from 0.5 to 1.0%, the morphology changes from triangular (111) faces with a weak preferred orientation to square (100) faces. At 2.0% Ch{sub 4} or higher the films become microcrystalline with cauliflower structures. Scanning electron microscopy analyses also demonstrate that selective deposition of undoped diamond films has been successfully achieved using a lift-off process with a resolution of at least 2 {mu}m. The x-ray diffraction and Raman spectra demonstrate that high quality diamond films have been achieved. The concentration of the nondiamond phases in the films grown at 1.0% CH{sub 4} can be estimated from the Raman spectra to be at less than 0.2% and increases with the CH{sub 4} concentration. The Raman spectra of the boron doped diamond films also indicate that the presence of boron tends to suppress the nondiamond phases in the films. Infrared spectra of the undoped diamond films show very weak CH stretch peaks which suggest that the hydrogen concentration is very low.

  19. UV/vis range photodetectors based on thin film ALD grown ZnO/Si heterojunction diodes

    NASA Astrophysics Data System (ADS)

    Alkis, Sabri; Tekcan, Burak; Nayfeh, Ammar; Kemal Okyay, Ali

    2013-10-01

    We present ultraviolet-visible (UV/vis) range photodetectors (PDs) based on thin film ZnO (n)/Si (p) heterojunction diodes. ZnO films are grown by the atomic layer deposition (ALD) technique at growth temperatures of 80, 150, 200 and 250 ° C. The fabricated ZnO (n)/Si (p) photodetectors (ZnO-Si-PDs) show good electrical rectification characteristics with ON/OFF ratios reaching up to 103. Under UV (350 nm wavelength) and visible (475 nm wavelength) light illumination, the ZnO-Si-PDs give photoresponsivity values of 30-37 mA W-1 and 74-80 mA W-1 at 0.5 V reverse bias, respectively. Photoluminescence (PL) spectra of ALD grown ZnO thin films are used to support the results.

  20. Refracted X-ray fluorescence (RXF) applied to the study of thin films and thermally-grown oxide scales

    SciTech Connect

    Koshelev, I.; Paulikas, A.P.; Veal, B.W.

    1999-02-01

    Refracted X-ray fluorescence (RXF) is a relatively new technique developed for studying properties of thin films. In this paper, formalism for analysis of RXF measurements is derived from a new perspective. The technique is applied to the study of thermally grown oxide scales; model predictions are tested. The evolution of chromia scales on Fe-25Cr-20Ni-0.3Y alloys and some aspects of alumina scales grown on {beta}-NiAl are investigated. Some of the data were taken in situ, during the oxidation process. Deposited films of Fe-25Cr-20Ni-0.3Y alloys of varying thickness and the oxidation of those films were also studied. The technique is generally applicable to thin-film studies. It provides scale-composition and depth-profile information, scale thicknesses and growth rates, and information about transient-phase evolution.

  1. Defect-free thin InAs nanowires grown using molecular beam epitaxy.

    PubMed

    Zhang, Zhi; Chen, Ping-Ping; Lu, Wei; Zou, Jin

    2016-01-21

    In this study, we designed a simple method to achieve the growth of defect-free thin InAs nanowires with a lateral dimension well below their Bohr radius on different substrate orientations. By depositing and annealing a thin layer of Au thin film on a (100) substrate surface, we have achieved the growth of defect-free uniform-sized thin InAs nanowires. This study provides a strategy to achieve the growth of pure defect-free thin nanowires.

  2. Anomalous Mn depth profiles for GaMnAs/GaAs(001) thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Xu, J. F.; Thibado, P. M.; Awo-Affouda, C.; Ramos, F.; Labella, V. P.

    Mn concentration depth profiles in Mn-doped GaAs thin films grown at substrate temperatures of 580 and 250 {\\deg}C using various Mn cell temperatures have been investigated with dynamic secondary ion mass spectrometry and Auger electron spectroscopy. When the samples are grown at a low substrate temperature of 250 {\\deg}C, the Mn distributes uniformly. For the samples grown at a high substrate temperature of 580 {\\deg}C, the concentration depth profiles are easily fitted with a temperature-dependent Fermi function only if the Mn concentration is above the solubility limit. However, when the Mn concentration is below the solubility limit, unexpected peaks are observed in the concentration depth profiles.

  3. Optical properties of metal oxynitride thin films grown with atmospheric plasma deposition

    NASA Astrophysics Data System (ADS)

    Hovish, Michael Q.; Dauskardt, Reinhold H.

    2016-10-01

    Thin films of tantalum oxynitride (TaO x N y ) and titanium oxynitride (TiO x N y ) are deposited using atmospheric plasma deposition and a suite of optical properties are reported. Tantalum and titanium ethoxide are introduced into the afterglow of a radio-frequency capacitively coupled plasma, facilitating the growth of oxynitride films on silicon and polycarbonate at temperatures below 180 °C. The plasma power and nitrogen flow within the plasma are varied between 60 and 120 W and between 0.1 and 0.3 LPM respectively. We use spectroscopic ellipsometry to show that the optical properties of the metal oxynitride films grown in this study are comparable to those synthesized with sol-gel methods. Measurement of both the extinction coefficient and the transmission on polycarbonate substrates indicates good transparency in the visible wavelengths of light. Additionally, the refractive index increases when increasing the number of reactive nitrogen species within the discharge. We use x-ray photoelectron spectroscopy to correlate the higher indexes observed at large secondary gas flows to the presence of metal oxynitride bonding. Single layer anti-reflection coatings are deposited on silicon, with a five-fold and seven-fold reduction in reflection for TaO x N y and TiO x N y coatings, respectively. In total, we have found that the modulation of nitrogen concentration within the plasma discharge results in good control over optical constants. In addition, we observe similarities between films deposited with atmospheric plasma and those reported for sol-gel, indicating an alternative processing route where solution chemistries are currently applied.

  4. On the radiation hardness of (Mg,Zn)O thin films grown by pulsed-laser deposition

    SciTech Connect

    Schmidt, Florian; Wenckstern, Holger von; Spemann, Daniel; Grundmann, Marius

    2012-07-02

    We report on electrical properties and the generation of the E4 defect in pulsed-laser deposited Mg{sub x}Zn{sub 1-x}O thin films irradiated with 2.25 MeV protons. Whereas the electrical properties of the Schottky diodes as well as the net doping density of the samples did not change due to irradiation, the concentration of the E4 defect increased proportional to the applied dose as revealed by deep level transient spectroscopy. The generation rate {eta}, is for binary ZnO thin films about 40 cm{sup -1}, a factor of 3 higher than in melt-grown single crystals, and increases to about 100 cm{sup -1} for the Mg-alloyed thin films.

  5. Evidence of rhombohedral structure within BiFeO3 thin film grown on SrTiO3

    NASA Astrophysics Data System (ADS)

    Bae, In-Tae; Naganuma, Hiroshi

    2015-03-01

    Comprehensive crystal structure analysis was performed for a BiFeO3 thin layer (∼30 nm) grown on a SrTiO3 substrate using cross-sectional transmission electron microscopy along three different zone axes. Nano-beam electron diffraction patterns combined with structure factor calculations and high-resolution transmission electron microscopy images unambiguously revealed that the BiFeO3 thin layer grew with a rhombohedral structure identical to its bulk form. No evidence of monoclinic and/or tetragonal distortion was found. The rhombohedral BiFeO3 thin layer was found to grow onto SrTiO3 by maintaining an epitaxial relationship in a manner minimizing the lattice mismatch at the BiFeO3/SrTiO3 interface.

  6. A comparative study of physico-chemical properties of CBD and SILAR grown ZnO thin films

    SciTech Connect

    Jambure, S.B.; Patil, S.J.; Deshpande, A.R.; Lokhande, C.D.

    2014-01-01

    Graphical abstract: Schematic model indicating ZnO nanorods by CBD (Z{sub 1}) and nanograins by SILAR (Z{sub 2}). - Highlights: • Simple methods for the synthesis of ZnO thin films. • Comparative study of physico-chemical properties of ZnO thin films prepared by CBD and SILAR methods. • CBD outperforms SILAR method. - Abstract: In the present work, nanocrystalline zinc oxide (ZnO) thin films have been successfully deposited onto glass substrates by simple and economical chemical bath deposition (CBD) and successive ionic layer adsorption reaction (SILAR) methods. These films were further characterized for their structural, optical, surface morphological and wettability properties. The X-ray diffraction (XRD) patterns for both CBD and SILAR deposited ZnO thin films reveal the highly crystalline hexagonal wurtzite structure. From optical studies, band gaps obtained are 2.9 and 3.0 eV for CBD and SILAR deposited thin films, respectively. The scanning electron microscope (SEM) patterns show growth of well defined randomly oriented nanorods and nanograins on the CBD and SILAR deposited samples, respectively. The resistivity of CBD deposited films (10{sup 2} Ω cm) is lower than that of SILAR deposited films (10{sup 5} Ω cm). Surface wettability studies show hydrophobic nature for both films. From the above results it can be concluded that CBD grown ZnO thin films show better properties as compared to SILAR method.

  7. Ultrafast carrier dynamics and the role of grain boundaries in polycrystalline silicon thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Titova, Lyubov V.; Cocker, Tyler L.; Xu, Sijia; Baribeau, Jean-Marc; Wu, Xiaohua; Lockwood, David J.; Hegmann, Frank A.

    2016-10-01

    We have used time-resolved terahertz spectroscopy to study microscopic photoconductivity and ultrafast photoexcited carrier dynamics in thin, pure, non-hydrogenated silicon films grown by molecular beam epitaxy on quartz substrates at temperatures ranging from 335 °C to 572 °C. By controlling the growth temperature, thin silicon films ranging from completely amorphous to polycrystalline with minimal amorphous phase can be achieved. Film morphology, in turn, determines its photoconductive properties: in the amorphous phase, carriers are trapped in bandtail states on sub-picosecond time scales, while the carriers excited in crystalline grains remain free for tens of picoseconds. We also find that in polycrystalline silicon the photoexcited carrier mobility is carrier-density-dependent, with higher carrier densities mitigating the effects of grain boundaries on inter-grain transport. In a film grown at the highest temperature of 572 °C, the morphology changes along the growth direction from polycrystalline with needles of single crystals in the bulk of the film to small crystallites interspersed with amorphous silicon at the top of the film. Depth profiling using different excitation wavelengths shows corresponding differences in the photoconductivity: the photoexcited carrier lifetime and mobility are higher in the first 100-150 nm from the substrate, suggesting that thinner, low-temperature grown polycrystalline silicon films are preferable for photovoltaic applications.

  8. X-ray diffraction and ellipsometric studies of zinc sulfide thin films grown by atomic layer epitaxy

    NASA Astrophysics Data System (ADS)

    Oikkonen, Markku

    1988-05-01

    The microstructure of ZnS thin films grown by atomic layer epitaxy (ALE) is investigated using X-ray diffraction and a single-line technique. Crystal structure, preferred orientation, crystallinity, crystallite size, crystallite size distribution, and microstrain are determined. Complex refractive indexes of the films are determined in the wavelength range 400 to 600 nm using spectroscopic ellipsometry. A two-layer model is employed, where the uppermost layer takes into account the surface roughness. Density of ZnS thin films is determined using ellipsometry and He(+)-ion backscattering spectrometry. In the first tens of nanometers of an ALE ZnS thin film the crystallinity and void content strongly depend on the substrate properties. Most of the films were grown on soda glass. It is found that after the bottom layer, at the distances from 50 to 100 nm to 300 to 400 nm from the substrate the crystallinity is good, crystallites are large, the specific orientation is strong, the void content is low, and the optical properties resemble those of bulk ZnS. At distances larger than 300 to 400 nm the surface roughness and the void content in the upper parts of the film increase because of the more and more randomly packed large crystallites. Substrate temperature and source materials affect the growth of all parts of the films.

  9. Structure disorder degree of polysilicon thin films grown by different processing: Constant C from Raman spectroscopy

    SciTech Connect

    Wang, Quan; Zhang, Yanmin; Hu, Ran; Ren, Naifei; Ge, Daohan

    2013-11-14

    Flat, low-stress, boron-doped polysilicon thin films were prepared on single crystalline silicon substrates by low pressure chemical vapor deposition. It was found that the polysilicon films with different deposition processing have different microstructure properties. The confinement effect, tensile stresses, defects, and the Fano effect all have a great influence on the line shape of Raman scattering peak. But the effect results are different. The microstructure and the surface layer are two important mechanisms dominating the internal stress in three types of polysilicon thin films. For low-stress polysilicon thin film, the tensile stresses are mainly due to the change of microstructure after thermal annealing. But the tensile stresses in flat polysilicon thin film are induced by the silicon carbide layer at surface. After the thin film doped with boron atoms, the phenomenon of the tensile stresses increasing can be explained by the change of microstructure and the increase in the content of silicon carbide. We also investigated the disorder degree states for three polysilicon thin films by analyzing a constant C. It was found that the disorder degree of low-stress polysilicon thin film larger than that of flat and boron-doped polysilicon thin films due to the phase transformation after annealing. After the flat polysilicon thin film doped with boron atoms, there is no obvious change in the disorder degree and the disorder degree in some regions even decreases.

  10. Extended wide band gap amorphous aluminium-doped zinc oxide thin films grown at liquid nitrogen temperature

    NASA Astrophysics Data System (ADS)

    Chou, H.; Yang, M. S.; Wu, C. P.; Tsao, Y. C.; Chen, B. J.; Liao, T. F.; Sun, S. J.; Chiou, J. W.

    2011-05-01

    Amorphous aluminium-doped zinc oxide (AZO) thin films are grown by standard RF sputtering at low temperatures on glass substrates. Due to poor thermal conductivity and thermal energy generated by the sputter gun, controlling the substrate surface temperature is the key to controlling the growth of amorphous and nanocrystalline films. The ratio of grains and amorphous part of the films can be controlled by selective growth conditions. During a transmission electron microscope (TEM) inspection process, the amorphous films react immediately and strongly with an electron beam and transform to a mixture of amorphous and nanocrystalline phases. The films having a mixture of amorphous and nanocrystalline phases, either as-grown or after transformation by irradiation of the electron beam, are stable in the TEM inspection, indicating that the low interface energy stabilizes the mixture phase. The optical band gap increases with the content of amorphous phase and is 4.3 eV for pure amorphous AZO films.

  11. Properties of CsI, CsBr and GaAs thin films grown by pulsed laser deposition

    SciTech Connect

    Brendel, V M; Garnov, S V; Yagafarov, T F; Iskhakova, L D; Ermakov, R P

    2014-09-30

    CsI, CsBr and GaAs thin films have been grown by pulsed laser deposition on glass substrates. The morphology and structure of the films have been studied using X-ray diffraction and scanning electron microscopy. The CsI and CsBr films were identical in stoichiometry to the respective targets and had a polycrystalline structure. Increasing the substrate temperature led to an increase in the density of the films. All the GaAs films differed in stoichiometry from the target. An explanation was proposed for this fact. The present results demonstrate that, when the congruent transport condition is not fulfilled, films identical in stoichiometry to targets can be grown by pulsed laser deposition in the case of materials with a low melting point and thermal conductivity. (interaction of laser radiation with matter)

  12. Improvement of laser molecular beam epitaxy grown SrTiO3 thin film properties by temperature gradient modulation growth

    NASA Astrophysics Data System (ADS)

    Li, Jin Long; Hao, J. H.; Li, Y. R.

    2007-09-01

    Oxygen diffusion at the SrTiO3/Si interface was analyzed. A method called temperature gradient modulation growth was introduced to control oxygen diffusion at the interface of SrTiO3/Si. Nanoscale multilayers were grown at different temperatures at the initial growing stage of films. Continuous growth of SrTiO3 films was followed to deposit on the grown sacrificial layers. The interface and crystallinity of SrTiO3/Si were investigated by in situ reflection high energy electron diffraction and x-ray diffraction measurements. It has been shown that the modulated multilayers may help suppress the interfacial diffusion, and therefore improve SrTiO3 thin film properties.

  13. Spin-dependent Fabry-Pérot interference from a Cu thin film grown on fcc Co(001).

    PubMed

    Wu, Y Z; Schmid, A K; Altman, M S; Jin, X F; Qiu, Z Q

    2005-01-21

    Spin-dependent electron reflection from a Cu thin film grown on Co/Cu(001) was investigated using spin-polarized low-energy electron microscopy (SPLEEM). Fabry-Pe rot type interference was observed and is explained using the phase accumulation model. SPLEEM images of the Cu overlayer reveal magnetic domains in the Co underlayer, with the domain contrast oscillating with electron energy and Cu film thickness. This behavior is attributed to the spin-dependent electron reflectivity at the Cu/Co interface which leads to spin-dependent Fabry-Pe rot electron interference in the Cu film.

  14. Improving stability of photoluminescence of ZnSe thin films grown by molecular beam epitaxy by incorporating Cl dopant

    SciTech Connect

    Wang, J. S.; Shen, J. L.; Chen, W. J.; Tsai, Y. H.; Wang, H. H.; Yang, C. S.; Chen, R. H.; Tsai, C. D.

    2011-01-10

    This investigation studies the effect of chlorine (Cl) dopant in ZnSe thin films that were grown by molecular beam epitaxy on their photoluminescence (PL) and the stability thereof. Free excitonic emission was observed at room-temperature in the Cl-doped sample. Photon irradiation with a wavelength of 404 nm and a power density of 9.1 W/cm{sup 2} has a much stronger effect on PL degradation than does thermal heating to a temperature of 150 deg. C. Additionally, this study shows that the generation of nonradiative centers by both photon irradiation and thermal heating can be greatly inhibited by incorporating Cl dopant.

  15. Superconducting YBa 2Cu 3O 7- δ thin film grown on metallic film evaporated on MgO

    NASA Astrophysics Data System (ADS)

    Verdyan, A.; Azoulay, J.; Lapsker, I.

    2001-03-01

    At present it is commonly accepted that thin film formation of YBa 2Cu 3O 7- δ (YBCO) on conducting substrate is one of the keys to further development of advanced devices in the microelectronic and other applications. We have grown YBCO thin films by resistive evaporation technique on MgO coated with metallic layers (Ni or Ag). A simple inexpensive vacuum system equipped with resistively heated boats for metal and precursor mixture of yttrium, copper and barium fluoride powders was used. X-ray diffraction (XRD) and scanning electron microscopy techniques were used for texture, morphology and surface analyses respectively. Electrical and magnetical properties were determined by a standard dc four-probe method. The way of heating process is shown to be critical parameter in the film quality. The physical and electrical properties of the YBCO films are discussed in light of the fact that XRD measurements done on the metallic buffer layers have revealed a multicrystalline structure.

  16. High quality, transferrable graphene grown on single crystal Cu(111) thin films on basal-plane sapphire

    NASA Astrophysics Data System (ADS)

    Reddy, Kongara M.; Gledhill, Andrew D.; Chen, Chun-Hu; Drexler, Julie M.; Padture, Nitin P.

    2011-03-01

    The current method of growing large-area graphene on polycrystalline Cu surfaces (foils or thin films) and its transfer to arbitrary substrates is technologically attractive. However, the quality of graphene can be improved significantly by growing it on single-crystal Cu surfaces. Here we show that high quality, large-area graphene can be grown on epitaxial single-crystal Cu(111) thin films on reusable basal-plane sapphire [α-Al2O3(0001)] substrates for transfer to another substrate. While enabling graphene growth on Cu single-crystal surfaces, this method has the potential to avoid the high cost and extensive damage to graphene associated with sacrificing bulk single-crystal Cu during graphene transfer.

  17. Magnetic properties of low-moment ferrimagnetic Heusler Cr 2 CoGa thin films grown by molecular beam epitaxy

    DOE PAGES

    Jamer, Michelle E.; Sterbinsky, George E.; Stephen, Gregory M.; ...

    2016-10-31

    Recently, theorists have predicted many materials with a low magnetic moment and large spin-polarization for spintronic applications. These compounds are predicted to form in the inverse Heusler structure; however, many of these compounds have been found to phase segregate. In this study, ordered Cr2CoGa thin films were synthesized without phase segregation using molecular beam epitaxy. The present as-grown films exhibit a low magnetic moment from antiferromagnetically coupled Cr and Co atoms as measured with superconducting quantum interface device magnetometry and soft X-ray magnetic circular dichroism. Electrical measurements demonstrated a thermally-activated semiconductor-like resistivity component with an activation energy of 87 meV.more » These results confirm spin gapless semiconducting behavior, which makes these thin films well positioned for future devices.« less

  18. A study on the epitaxial Bi{sub 2}Se{sub 3} thin film grown by vapor phase epitaxy

    SciTech Connect

    Lin, Yen-Cheng; Chen, Yu-Sung; Lee, Chao-Chun; Wu, Jen-Kai; Lee, Hsin-Yen E-mail: hyli@ntu.edu.tw; Liang, Chi-Te; Chang, Yuan Huei E-mail: hyli@ntu.edu.tw

    2016-06-15

    We report the growth of high quality Bi{sub 2}Se{sub 3} thin films on Al{sub 2}O{sub 3} substrates by using chemical vapor deposition. From the atomic force microscope, x-ray diffraction and transmission electron microscope measurements we found that the films are of good crystalline quality, have two distinct domains and can be grown epitaxially on the Al{sub 2}O{sub 3} substrate. Carrier concentration in the sample is found to be 1.1 × 10{sup 19} cm{sup −3} between T = 2 K to T = 300 K, and electron mobility can reach 954 cm{sup 2}/V s at T = 2 K. Weak anti-localization effect is observed in the low temperature magneto-transport measurement for the sample which indicates that the thin film has topological surface state.

  19. Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

    NASA Astrophysics Data System (ADS)

    Hojabri, Alireza

    2016-09-01

    Zirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase of annealing times in range 60-240 min. The composition of films was determined by Rutherford back scattering spectroscopy. Atomic force microscopy results exhibited that surface morphology and roughness of films depend on the annealing time. The refractive index of the films was calculated using Swanepoel's method. The optical band gap energy of annealed films decreased from 5.50 to 5.34 eV with increasing thermal annealing time.

  20. Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Hazra, D.; Tsavdaris, N.; Jebari, S.; Grimm, A.; Blanchet, F.; Mercier, F.; Blanquet, E.; Chapelier, C.; Hofheinz, M.

    2016-10-01

    Niobium nitride (NbN) is widely used in high-frequency superconducting electronics circuits because it has one of the highest superconducting transition temperatures ({T}{{c}}˜ 16.5 {{K}}) and largest gap among conventional superconductors. In its thin-film form, the T c of NbN is very sensitive to growth conditions and it still remains a challenge to grow NbN thin films (below 50 nm) with high T c. Here, we report on the superconducting properties of NbN thin films grown by high-temperature chemical vapor deposition (HTCVD). Transport measurements reveal significantly lower disorder than previously reported, characterized by a Ioffe-Regel parameter ({k}{{F}}{\\ell }) ˜ 12. Accordingly we observe {T}{{c}}˜ 17.06 {{K}} (point of 50% of normal state resistance), the highest value reported so far for films of thickness 50 nm or less, indicating that HTCVD could be particularly useful for growing high quality NbN thin films.

  1. Optical parameters of Al-doped ZnO nanorod array thin films grown via the hydrothermal method.

    PubMed

    Kim, Soaram; Kim, Min Su; Nam, Giwoong; Park, Hyunggil; Yoon, Hyunsik; Leem, Jae-Young

    2013-09-01

    ZnO seed layers were deposited onto a quartz substrate using the sol--gel method, and Al-doped ZnO (AZO) nanorod array thin films with different Al concentrations that ranged from 0 to 2.0 at. % were grown on the ZnO seed layers via the hydrothermal method. Optical parameters, including the optical band gap, the absorption coefficient, the Urbach energy, the refractive index, the dispersion parameter, and the optical conductivity, were studied to investigate the effects of Al doping on the optical properties of AZO nanorod array thin films. The optical band gaps of the ZnO and AZO nanorod array thin films were 3.206 at 0 at.%, 3.214 at 0.5 at.%, 3.226 at 1.5 at.%, and 3.268 at 2.0 at.%. The Urbach energy gradually decreased from 126 meV (0 at.%) to 70 meV (2.0 at.%) as the Al concentration was increased. The dispersion energy, the single-oscillator energy, the average oscillator wavelength, the average oscillator strength, the refractive index, and the optical conductivity of the AZO nanorod array thin films were all affected by Al doping.

  2. Pseudo capacitive performance of copper oxide thin films grown by RF sputtering

    SciTech Connect

    Reddy, B. Purusottam; Ganesh, K. Sivajee; Hussain, O. M.

    2015-06-24

    Thin films of Copper Oxide were prepared by radio frequency magnetron sputtering on steel substrates maintained at 250°C under different RF powers ranging from 150W to 250W by keeping the sputtering pressure at 5.7×10{sup −3} mbar and O{sub 2}:Ar ratio of 1:7. The influence of RF power on the pseudo capacitive performance of thin films was studied. The X-ray diffraction studies and Raman studies indicates that all the thin films exhibits CuO phase. The electrochemical studies was done by using three electrode configuration with platinum as reference electrode. From the cyclic voltammetry studies a high rate pseudocapacitance of 227 mFcm{sup −2} at 0.5 mVs{sup −1} and 77% of capacity retention after 1000 cycles was obtained for the CuO thin films prepared at an RF power of 220W.

  3. Post-annealing effects on ZnS thin films grown by using the CBD method

    NASA Astrophysics Data System (ADS)

    Ahn, Heejin; Um, Youngho

    2015-09-01

    Herein, the structural, morphological, and optical properties of zinc sulfide (ZnS) thin films deposited via the chemical bath deposition method are reported. These films were deposited on soda-lime glass (SLG) substrates by using ZnSO4, thiourea, and 25% ammonia at 90 °C. The effect of changing the annealing temperature from 100 °C to 300 °C on the properties of the ZnS thin films was investigated. X-ray diffraction (XRD) patterns showed that the ZnS thin film annealed at 100 °C had an amorphous structure; however, as the annealing temperature was increased, the crystalline quality of the thin film was enhanced. Moreover, transmission measurements showed that the optical transmittance was about 80% for wavelengths above 500 nm. The band gap energy (E g ) value of the film annealed at 300 °C was decreased to about 3.82 eV.

  4. Theoretical studies of epitaxially grown Co and Ni thin films on (111) metallic substrates

    NASA Astrophysics Data System (ADS)

    Zelený, M.; Šob, M.

    2008-04-01

    Total energies of hcp and trigonally distorted fcc Co and Ni are studied from first principles. Regions of stability of these structures are found and the behavior of the total energies is used to explain and predict the lattice parameters and magnetic states of Co and Ni thin films on various (111) substrates. The stresses needed to keep the thin films coherent with the substrates are also determined. The theoretical results agree surprisingly well with available experimental data.

  5. Semiconductor-insulator transition in VO{sub 2} (B) thin films grown by pulsed laser deposition

    SciTech Connect

    Rúa, Armando; Díaz, Ramón D.; Lysenko, Sergiy; Fernández, Félix E.

    2015-09-28

    Thin films of B-phase VO{sub 2} were grown by pulsed-laser deposition on glass and (100)-cut MgO substrates in a temperature range from 375 to 425 °C and at higher gas pressures than usual for this technique. The films were strongly oriented, with ab-planes parallel to the substrate surface. Detailed study of surface morphology through Atomic Force Microscopy images suggest significant differences in evolution as a function of growth temperature for films on the two types of substrates. Measurements of electrical conductivities through cooling-heating cycles from room temperature to 120 K showed changes of five orders of magnitude, with steeper changes between room temperature and ∼150 K, which corresponds with the extended and reversible phase transition known to occur for this material. At lower temperatures conductivities exhibited Arrhenius behavior, indicating that no further structural change was occurring and that conduction is thermally activated. In this lower temperature range, conductivity of the samples can be described by the near-neighbor hopping model. No hysteresis was found between the cooling and heating braches of the cycles, which is at variance with previous results published for VO{sub 2} (B). This apparent lack of hysteresis for thin films grown in the manner described and the large conductivity variation as a function of temperature observed for the samples suggests this material could be of interest for infrared sensing applications.

  6. Crystallinity of Li-doped Gd2O3:Eu3+ thin-film phosphors grown on Si (100) substrate

    NASA Astrophysics Data System (ADS)

    Yi, Soung Soo; Bae, Jong Seong; Moon, Byung Kee; Jeong, Jung Hyun; Kim, Jung Hwan

    2005-02-01

    Gd2O3:Eu3+ and Li-doped Gd2O3:Eu3+ luminescent thin films have been grown on Si (100) substrates using pulsed-laser deposition. The films grown at different deposition conditions show different microstructural and luminescent characteristics. Both cubic and monoclinic crystalline structures were observed in both Gd2O3:Eu3+ and Li-doped Gd2O3:Eu3+ films, but the cubic phase becomes more dominant and the ratio of peak values IC(222)/IM(-402) increases rapidly for Li-doped Gd2O3:Eu3+ films. The photoluminescence brightness data obtained from Li-doped Gd2O3:Eu3+ films indicate that Si (100) is a promising substrate for growth of high-quality Li-doped Gd2O3:Eu3+ thin-film red phosphor. In particular, the incorporation of Li + ions into the Gd2O3 lattice induced changes of crystallinity, surface roughness, and photoluminescence. The highest emission intensity was observed with Gd1.84Li0.08Eu0.08O3, whose brightness was a factor of 2.1 larger than that from Gd2O3:Eu3+ films. This phosphor is promising for applications in flat-panel displays.

  7. KCl ultra-thin films with polar and non-polar surfaces grown on Si(111)7 × 7

    PubMed Central

    Beinik, Igor; Barth, Clemens; Hanbücken, Margrit; Masson, Laurence

    2015-01-01

    The growth of ultra-thin KCl films on the Si(111)7 × 7 reconstructed surface has been investigated as a function of KCl coverage and substrate temperature. The structure and morphology of the films were characterized by means of scanning tunneling microscopy (STM) under ultra-high vacuum (UHV) conditions. Detailed analysis of the atomically resolved STM images of islands grown at room and high temperatures (400 K–430 K) revealed the presence of KCl(001) and KCl(111) islands with the ratio between both structures depending on the growth temperature. At room temperature, the growth of the first layer, which covers the initial Si(111)7 × 7 surface, contains double/triple atomic layers of KCl(001) with a small fraction of KCl(111) islands. The high temperature growth promotes the appearance of large KCl(111) areas, which are built up by three atomic layers. At room and high temperatures, flat and atomically well-defined ultra-thin KCl films can be grown on the Si(111)7 × 7 substrate. The formation of the above mentioned (111) polar films is interpreted as a result of the thermally activated dissociative adsorption of KCl molecules on Si(111)7 × 7, which produces an excess of potassium on the Si surface. PMID:25650038

  8. Optical, Electrical, and UV Photoresponse Properties of Fluorine-Doped ZnO Thin Films Grown on Flexible Mica Substrates

    NASA Astrophysics Data System (ADS)

    Kim, Younggyu; Leem, Jae-Young

    2015-12-01

    Fluorine-doped ZnO (FZO) thin films have several potential applications, for instance, in low-cost optoelectronic devices; understanding how their optical, electrical, and photoresponse properties depend on and can be controlled via the synthesis conditions is essential for application of these systems. In this study, FZO thin films with different annealing temperatures were grown on muscovite mica substrates via sol-gel spin-coating. In photoluminescence measurements, a strong peak in the ultraviolet (UV) region and a broad peak in the visible region were observed for all films, being strongly dependent on the annealing temperature. The transmittance of the annealed films was slightly higher than that of as-grown film, and the absorption edges in the transmittance spectra red-shifted with increasing annealing temperature. The optical bandgap and Urbach energy of the films were calculated from the absorption coefficient values, using the Tauc and Urbach relations, respectively. Finally, the electrical (i.e., resistivity and carrier concentration) and photoresponse properties of the films were investigated to assess their applicability for use in FZO-based UV detectors.

  9. Electrical and optical properties of VO2 thin films grown on various sapphire substrates by using RF sputtering deposition

    NASA Astrophysics Data System (ADS)

    Jung, Dae Ho; So, Hyeon Seob; Ko, Kun Hee; Park, Jun Woo; Lee, Hosun; Nguyen, Trang Thi Thu; Yoon, Seokhyun

    2016-12-01

    VO2 thin films were grown on a-, c-, m-, and r-plane sapphire and SiO2/Si substrates under identical conditions by using RF sputtering deposition from a VO2 target. The structural and the morphological properties of all VO2 films were investigated. The grain sizes of the VO2 films varied between 268 nm and 355 nm depending on the substrate's orientation. The electrical and the optical properties of all VO2 thin films were examined in detail. The metal-insulator transition temperature (TMI) varied with the substrate's orientation. The (200)/(bar 211 )-oriented VO2 films on the a-plane sapphire showed the lowest TMI of about 329.3 K (56.3 °C) while the (020)/(002)-VO2 films on the c-plane sapphire displayed the highest TMI of about 339.6 K (66.6 °C). The VO2 films showed reversible changes in the resistivity as large as 1.19 × 105 and a hysteresis of 2 K upon traversing the transition temperature. The variations observed in the TMI with respect to the substrate's orientation were due to changes in the lattice strain and the grain size distribution. Raman spectroscopy showed that metal (rutile) - insulator (monoclinic) transitions occurred via the M2 phase for VO2 films on the c-plane substrate rather than the direct M1 to rutile transition. The shifts in the phonon frequencies of the VO2 film grown on various sapphire substrates were explained in terms of the strain along the V-V atomic bond direction (cR). Our work shows a possible correlation between the transition parameters ( e.g., TMI, sharpness, and hysteresis width) and the width ( σ) of the grain size distribution. It also shows a possible correlation between the TMI and the resistivities at the insulating and the metallic phases for VO2 films grown on various sapphire substrates.

  10. Characterization of ZnO thin films grown on different p-Si substrate elaborated by solgel spin-coating method

    SciTech Connect

    Chebil, W.; Fouzri, A.; Fargi, A.; Azeza, B.; Zaaboub, Z.; and others

    2015-10-15

    Highlights: • High quality ZnO thin films grown on different p-Si substrates were successful obtained by sol–gel process. • PL measurement revealed that ZnO thin film grown on porous Si has the better optical quality. • I–V characteristics for all heterojunctions exhibit successful diode formation. • The diode ZnO/PSi shows a better photovoltaic effect under illumination with a maximum {sub Voc} of 0.2 V. - Abstract: In this study, ZnO thin films are deposited by sol–gel technique on p-type crystalline silicon (Si) with [100] orientation, etched silicon and porous silicon. The structural analyses showed that the obtained thin films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented along the c-axis direction. Morphological study revealed the presence of rounded and facetted grains irregularly distributed on the surface of all samples. PL spectra at room temperature revealed that ZnO thin film grown on porous Si has a strong UV emission with low defects in the visible region comparing with ZnO grown on plat Si and etched Si surface. The heterojunction parameters were evaluated from the (I–V) under dark and illumination at room temperature. The ideality factor, barrier height and series resistance of heterojunction grown on different p-Si substrates are determined by using different methods. Best electrical properties are obtained for ZnO layer deposited on porous silicon.

  11. Some of structural and morphological optimization of GaN thin film on Si(100) substrate grown by RF sputter

    NASA Astrophysics Data System (ADS)

    Mantarcı, Asim; Kundakçı, Mutlu

    2017-04-01

    One of important material of III-nitrides can be said to be GaN with direct-wide band gap ( 3.4 eV) and many industrial devices such as solar cell, LED has been based on GaN thin film. In this research, we elaborately investigated growth of GaN thin film on Si(100) substrate by RF sputter technique and characterization of the film. We have successfully grown GaN thin film on Si substrate with hexagonal structure which has been confirmed by analysis of X-ray measurements. Also, we obtained structural properties of GaN film by (XRD) X-ray Diffraction measurements depending on different Argon, nitrogen and RF power values. During experiment, the value from 25sccm to 100sccm Argon gas value, the value from 0sccm to 4sccm Nitrogen gas value and from 50 watt to 125 watt RF power value has been applied. Among these values, we determined the best film in terms of crystalline structure of film. From AFM results, we attained and analyzed average roughness (Ra), maximum peak height (Rp), and maximum depth (Rv), average absolute slope of the profile (Δa)(°) of the fılms successfully. The film having the lowest roughness (Ra) has been achieved depending on different Argon, nitrogen and RF power values. Atomic Force Microscopy results confirmed that some of the films have homogeneous and uniform structure without any holes and crack; but others has voids referring impurities coming from growth process. To sum up, not only growing GaN thin film on Si substrate has been investigated, but also some of structural and morphological parameters' optimization has been studied, analyzed and the best film was determined in view of varied Argon, nitrogen and RF power values. For future direction, optimization of GaN thin film in detail can enable us to fabricate high quality film; therefore it will helps to improving device technology.

  12. Fractal features of CdTe thin films grown by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Hosseinpanahi, Fayegh; Raoufi, Davood; Ranjbarghanei, Khadijeh; Karimi, Bayan; Babaei, Reza; Hasani, Ebrahim

    2015-12-01

    Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30 W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases.

  13. Structural and morphological properties of metallic thin films grown by pulsed laser deposition for photocathode application

    NASA Astrophysics Data System (ADS)

    Lorusso, A.; Gontad, F.; Caricato, A. P.; Chiadroni, E.; Broitman, E.; Perrone, A.

    2016-03-01

    In this work yttrium and lead thin films have been deposited by pulsed laser deposition technique and characterized by ex situ different diagnostic methods. All the films were adherent to the substrates and revealed a polycrystalline structure. Y films were uniform with a very low roughness and droplet density, while Pb thin films were characterized by a grain morphology with a relatively high roughness and droplet density. Such metallic materials are studied because they are proposed as a good alternative to copper and niobium photocathodes which are generally used in radiofrequency and superconducting radiofrequency guns, respectively. The photoemission performances of the photocathodes based on Y and Pb thin films have been also studied and discussed.

  14. YCo5±x thin films with perpendicular anisotropy grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Sharma, S.; Hildebrandt, E.; Sharath, S. U.; Radulov, I.; Alff, L.

    2017-06-01

    The synthesis conditions of buffer-free (00l) oriented YCo5 and Y2Co17 thin films onto Al2O3 (0001) substrates have been explored by molecular beam epitaxy (MBE). The manipulation of the ratio of individual atomic beams of Yttrium, Y and Cobalt, Co, as well as growth rate variations allows establishing a thin film phase diagram. Highly textured YCo5±x thin films were stabilized with saturation magnetization of 517 emu/cm3 (0.517 MA/m), coercivity of 4 kOe (0.4 T), and anisotropy constant, K1, equal to 5.34 ×106 erg/cm3 (0.53 MJ/m3). These magnetic parameters and the perpendicular anisotropy obtained without additional underlayers make the material system interesting for application in magnetic recording devices.

  15. Properties of SnS thin films grown by physical vapour deposition

    NASA Astrophysics Data System (ADS)

    Ganchev, M.; Vitanov, P.; Sendova-Vassileva, M.; Popkirov, G.; Dikov, H.

    2016-02-01

    Thin films of tin sulfide (SnS) were prepared by thermal evaporation technique on glass substrates and on n-type Si substrate and their physical properties were studied. The phase of the obtained thin films before and after thermal treatment was confirmed by X-ray diffraction analysis and Raman spectra. Optical transmission and reflection spectra were measured in the wavelength range 300-1800 nm, and the data were used to determine the direct and indirect optical band gaps. Four-point measurements have revealed that SnS thin film exhibits p-type conduction. Current-voltage characteristics of the SnS/ n-Si structures demonstrate strong photosensitivity and photovoltaic effect. However, in order to be able to evaluate the potential applicability of this heterojunction for photovoltaic or electronic devices, further study and technological optimization has to be conducted.

  16. X-ray photoelectron spectroscopy study of the growth kinetics of biomimetically grown hydroxyapatite thin-film coatings

    NASA Astrophysics Data System (ADS)

    McLeod, K.; Kumar, S.; Dutta, N. K.; Smart, R. St. C.; Voelcker, N. H.; Anderson, G. I.

    2010-09-01

    Hydroxyapatite (HA) thin-film coatings grown biomimetically using simulated body fluid (SBF) are desirable for a range of applications such as improved fixation of fine- and complex-shaped orthopedic and dental implants, tissue engineering scaffolds and localized and sustained drug delivery. There is a dearth of knowledge on two key aspects of SBF-grown HA coatings: (i) the growth kinetics over short deposition periods, hours rather than weeks; and (ii) possible difference between the coatings deposited with and without periodic SBF replenishment. A study centred on these aspects is reported. X-ray photoelectron spectroscopy (XPS) has been used to study the growth kinetics of SBF-grown HA coatings for deposition periods ranging from 0.5 h to 21 days. The coatings were deposited with and without periodic replenishment of SBF. The XPS studies revealed that: (i) a continuous, stable HA coating fully covered the titanium substrate after a growth period of 13 h without SBF replenishment; (ii) thicker HA coatings about 1 μm in thickness resulted after a growth period of 21 days, both with and without SBF replenishment; and (iii) the Ca/P ratio at the surface of the HA coating was significantly lower than that in its bulk. No significant difference between HA grown with and without periodic replenishment of SBF was found. The coatings were determined to be carbonated, a characteristic desirable for improved implant fixation. The atomic force and scanning electron microscopies results suggested that heterogeneous nucleation and growth are the primary deposition mode for these coatings. Primary osteoblast cell studies demonstrated the biocompatibility of these coatings, i.e., osteoblast colony coverage of approximately 80%, similar to the control substrate (tissue culture polystyrene).

  17. Thin film transistors of single-walled carbon nanotubes grown directly on glass substrates.

    PubMed

    Bae, Eun Ju; Min, Yo-Sep; Kim, Un Jeong; Park, Wanjun

    2007-12-12

    We report a transistor of randomly networked single-walled carbon nanotubes on a glass substrate. The carbon nanotube networks acting as the active components of the thin film transistor were selectively formed on the transistor channel areas that were previously patterned with catalysts to avoid the etching process for isolating nanotubes. The nanotube density was more than 50 microm(-2), which is much larger than the percolation threshold. Transistors were successfully fabricated with a conducting and transparent ZnO for the back-side gate and the top-side gate. This allows the transparent electronics or suggests thin film applications of nanotubes for future opto-electronics.

  18. Thickness-Dependent Permanent Magnet Properties of Zr2 Co_{11} Thin Films Grown on Si with Pt Underlayer

    NASA Astrophysics Data System (ADS)

    Yüzüak, Gizem Durak; Yüzüak, Ercüment; Teichert, Niclas; Hütten, Andreas; Elerman, Yalçın

    2017-03-01

    Zr-Co is one of the essential magnetic materials due to its interesting magnetic and structural properties. In this work, we studied the magnetic and structural properties of Zr2 Co_{11} thin films of different thicknesses grown on Si substrate with Pt underlayer. The structural properties and chemical composition of the Zr2 Co_{11} films were investigated by X-ray diffraction analysis, scanning electron microscopy (SEM) with energy-dispersive X-ray (EDX) analysis, and atomic force microscopy-magnetic force microscopy measurements. The saturation magnetization, M(H) characteristic, and Henkel plots of the Zr-Co films were obtained by vibrating-sample magnetometry. The results show that H_{c} and (BH)_{\\max } were enhanced with decreasing layer thickness of Zr-Co. For 10-nm Zr2 Co_{11} with 20-nm Pt underlayer thin film, we observed coercive field of 2 kOe with energy product of 0.7 MGOe. Our results may be valuable for use of Zr2 Co_{11} thin films in nanomagnet applications.

  19. Band dispersion near the Fermi level for VO2 thin films grown on TiO2 (001) substrates

    NASA Astrophysics Data System (ADS)

    Saeki, K.; Wakita, T.; Muraoka, Y.; Hirai, M.; Yokoya, T.; Eguchi, R.; Shin, S.

    2009-09-01

    We have performed angle-resolved photoemission spectroscopy (ARPES) measurements of VO2 using epitaxial thin films and observed the band dispersion near the Fermi level (EF) for this compound. The VO2 thin films have been grown on TiO2 (001) single-crystal substrates using pulsed laser deposition. The films exhibit a first-order metal-insulator transition (MIT) at 305 K. In the ARPES spectra of the metallic phase for the films, the O2p band shows highly dispersive features in the binding-energy range of 3-8 eV along the Γ-Z direction. Also, the V3d state shows two dispersive bands around the Γ point near EF , indicative of two electron pockets centered at the Γ point. Both electron pockets have an occupied bandwidth of about 0.4 eV. Assuming the parabolic energy bands around the Γ point, the effective-mass ratios of the two electron pockets are estimated to be about 0.2 and 1. The present work indicates that the ARPES measurements using epitaxial thin films are promising for determining the band structure of VO2 and thus would play a crucial role to elucidate the mechanism of the MIT in VO2 .

  20. Substrate dependent structural, optical and electrical properties of ZnS thin films grown by RF sputtering

    NASA Astrophysics Data System (ADS)

    Pathak, Trilok K.; Kumar, Vinod; Purohit, L. P.; Swart, H. C.; Kroon, R. E.

    2016-10-01

    Zinc sulphide (ZnS) films are of great importance for applications in various optoelectronic devices. ZnS thin films were grown on glass, indium tin oxide (ITO) and Corning glass substrates by radio-frequency magnetron sputtering at a temperature of 373 K and a comparative study of the structural, optical and electrical properties was performed using X-ray diffraction (XRD), scanning electron microscopy, optical and current-voltage (I-V) measurements. The XRD patterns showed that the sputtered thin films exhibited good crystallinity with the (111) peak around 2θ=28.3° indicating preferential orientation of the cubic structure. The maximum strain and most densely packed grains were obtained for the Corning glass substrate. The transmittance spectra of the films were measured in the wavelength range from 200 to 800 nm, showing that the films are about 77% transparent in the visible region. A slight change of 3.50 eV to 3.54 eV was found for the bandgap of the films deposited on different substrates. The ZnS thin films deposited on Corning glass show better crystallinity, morphology and I-V characteristics than that deposited on ordinary glass and ITO substrates.

  1. Effects of a Pretreatment on Al-Doped ZnO Thin Films Grown by Atomic Layer Deposition.

    PubMed

    Ko, Byoung-Soo; Lee, Sang-Ju; Kim, Dae-Hwan; Hwang, Dae-Kue

    2015-03-01

    In this study, we investigated the electrical, structural, and optical properties of Al-doped ZnO (AZO) thin films approximately 50 nm thick grown by atomic layer deposition (ALD) on glass substrates at 200 °C. An H2O pretreatment was conducted for all AZO samples. The electrical properties of the AZO thin film were improved after the pretreatment process. The Al doping concentrations were controlled by inserting an Al2O3 cycle after every "n" ZnO cycles while varying n from 99 to 16. As the doping concentration increases, the resistivity decreases and the optical band gap increases. When the Al2O3 cycle ratio is 5%, the electrical resistivity showed the lowest value of 4.66 x 10(-3) Ω cm. A carrier concentration of 1.10 x 10(20) cm(-3), and the optical transmittance exceeding 90% were obtained in the visible and near-infrared region. The thin film was strongly textured along the (100) direction in the X-ray diffraction patterns.

  2. Roughness of CdTe thin films grown on glass by hot wall epitaxy

    NASA Astrophysics Data System (ADS)

    Leal, F. F.; Ferreira, S. O.; Menezes-Sobrinho, I. L.; Faria, T. E.

    2005-01-01

    Cadmium telluride films were grown on glass substrates using the hot wall epitaxy (HWE) technique. The samples were polycrystalline with a preferential (111) orientation. Scanning electron micrographs reveal a grain size between 0.1 and 0.5 µm. The surface morphology of the samples was studied by measuring the roughness profile using a stylus profiler. The roughness as a function of growth time and scale size were investigated to determine the growth and roughness exponents, β and α, respectively. From the results we can conclude that the growth surface has a self-affine character with a roughness exponent α equal to 0.69 ± 0.03 and almost independent of growth time. The growth exponent β was equal to 0.38 ± 0.06. These values agree with that determined previously for CdTe(111) films grown on GaAs(100).

  3. Enhancement in the photocatalytic nature of nitrogen-doped PVD-grown titanium dioxide thin films

    NASA Astrophysics Data System (ADS)

    Tavares, C. J.; Marques, S. M.; Viseu, T.; Teixeira, V.; Carneiro, J. O.; Alves, E.; Barradas, N. P.; Munnik, F.; Girardeau, T.; Rivière, J.-P.

    2009-12-01

    Nitrogen-doped titanium dioxide semiconductor photocatalytic thin films have been deposited by unbalanced reactive magnetron physical vapor deposition on glass substrates for self-cleaning applications. In order to increase the photocatalytic efficiency of the titania coatings, it is important to enhance the catalysts absorption of light from the solar spectra. Bearing this fact in mind, a reduction in the titania semiconductor band-gap has been attempted by using nitrogen doping from a coreactive gas mixture of N2:O2 during the titanium sputtering process. Rutherford backscattering spectroscopy was used in order to assess the composition of the titania thin films, whereas heavy-ion elastic recoil detection analysis granted the evaluation of the doping level of nitrogen. X-ray photoelectron spectroscopy provided valuable information about the cation-anion binding within the semiconductor lattice. The as-deposited thin films were mostly amorphous, however, after a thermal annealing in vacuum at 500 °C the crystalline polymorph anatase and rutile phases have been developed, yielding an enhancement in the crystallinity. Spectroscopic ellipsometry experiments enabled the determination the refractive index of the thin films as a function of the wavelength, while from the optical transmittance it was possible to estimate the semiconductor indirect band-gap of these coatings, which has been proven to decrease as the N-doping increases. The photocatalytic performance of the titania films has been characterized by the degradation rate of an organic reactive dye under UV/visible irradiation. It has been found that for a certain critical limit of 1.19 at. % of nitrogen doping in the titania anatase crystalline lattice enhances the photocatalytic behavior of the thin films and it is in accordance with the observed semiconductor band-gap narrowing to 3.18 eV. By doping the titania lattice with nitrogen, the photocatalytic activity is enhanced under both UV and visible light.

  4. Enhancement in the photocatalytic nature of nitrogen-doped PVD-grown titanium dioxide thin films

    SciTech Connect

    Tavares, C. J.; Marques, S. M.; Viseu, T.; Teixeira, V.; Carneiro, J. O.; Alves, E.; Barradas, N. P.; Munnik, F.; Girardeau, T.; Riviere, J.-P.

    2009-12-01

    Nitrogen-doped titanium dioxide semiconductor photocatalytic thin films have been deposited by unbalanced reactive magnetron physical vapor deposition on glass substrates for self-cleaning applications. In order to increase the photocatalytic efficiency of the titania coatings, it is important to enhance the catalysts absorption of light from the solar spectra. Bearing this fact in mind, a reduction in the titania semiconductor band-gap has been attempted by using nitrogen doping from a coreactive gas mixture of N{sub 2}:O{sub 2} during the titanium sputtering process. Rutherford backscattering spectroscopy was used in order to assess the composition of the titania thin films, whereas heavy-ion elastic recoil detection analysis granted the evaluation of the doping level of nitrogen. X-ray photoelectron spectroscopy provided valuable information about the cation-anion binding within the semiconductor lattice. The as-deposited thin films were mostly amorphous, however, after a thermal annealing in vacuum at 500 deg. C the crystalline polymorph anatase and rutile phases have been developed, yielding an enhancement in the crystallinity. Spectroscopic ellipsometry experiments enabled the determination the refractive index of the thin films as a function of the wavelength, while from the optical transmittance it was possible to estimate the semiconductor indirect band-gap of these coatings, which has been proven to decrease as the N-doping increases. The photocatalytic performance of the titania films has been characterized by the degradation rate of an organic reactive dye under UV/visible irradiation. It has been found that for a certain critical limit of 1.19 at. % of nitrogen doping in the titania anatase crystalline lattice enhances the photocatalytic behavior of the thin films and it is in accordance with the observed semiconductor band-gap narrowing to 3.18 eV. By doping the titania lattice with nitrogen, the photocatalytic activity is enhanced under both UV and

  5. Local Structures and Interface Morphology of InGaAsN Thin Films Grown on GaAs

    SciTech Connect

    Allerman, A.A.; Chen, J.G.; Geisz, J.F.; Huang, S.; Hulbert, S.L.; Jones, E.D.; Kao, Y.H.; Kurtz, S.; Kurtz, S.R.; Olson, J.M.; Soo, Y.L.

    1999-02-23

    The compound semiconductor system InGaAsN exhibits many intriguing properties which are particularly useful for the development of innovative high efficiency thin film solar cells and long wavelength lasers. The bandgap in these semiconductors can be varied by controlling the content of N and In and the thin films can yet be lattice-matched to GaAs. In the present work, x-ray absorption fine structure (XAFS) and grazing incidence x-ray scattering (GIXS) techniques have been employed to probe the local environment surrounding both N and In atoms as well as the interface morphology of InGaAsN thin films epitaxially grown on GaAs. The soft x-ray XAFS results around nitrogen K-edge reveal that N is in the sp{sup 3} hybridized bonding configuration in InGaAsN and GaAsN, suggesting that N impurities most likely substitute for As sites in these two compounds. The results of In K-edge XAFS suggest a possible trend of a slightly larger coordination number of As nearest neighbors around In atoms in InGaAsN samples with a narrower bandgap whereas the In-As interatomic distance remains practically the same as in InAs within the experimental uncertainties. These results combined suggest that N-substitution of the As sites plays an important role of bandgap-narrowing while in the meantime counteracting the compressive strain caused by In-doping. Grazing incidence x-ray scattering (GIXS) experiments verify that InGaAsN thin films can indeed form very smooth interfaces with GaAs yielding an average interfacial roughness of 5-20{angstrom}.

  6. Nanocolumnar interfaces and enhanced magnetic coercivity in preferentially oriented cobalt ferrite thin films grown using oblique-angle pulsed laser deposition.

    PubMed

    Mukherjee, Devajyoti; Hordagoda, Mahesh; Hyde, Robert; Bingham, Nicholas; Srikanth, Hariharan; Witanachchi, Sarath; Mukherjee, Pritish

    2013-08-14

    Highly textured cobalt ferrite (CFO) thin films were grown on Si (100) substrates using oblique-angle pulsed laser deposition (α-PLD). X-ray diffraction and in-depth strain analysis showed that the obliquely deposited CFO films had both enhanced orientation in the (111) crystal direction as well as tunable compressive strains as a function of the film thicknesses, in contrast to the almost strain-free polycrystalline CFO films grown using normal-incidence PLD under the same conditions. Using in situ optical plume diagnostics the growth parameters in the α-PLD process were optimized to achieve smoother film surfaces with roughness values as low as 1-2 nm as compared to the typical values of 10-12 nm in the normal-incidence PLD grown films. Cross-sectional high resolution transmission electron microscope images revealed nanocolumnar growth of single-crystals of CFO along the (111) crystallographic plane at the film-substrate interface. Magnetic measurements showed larger coercive fields (∼10 times) with similar saturation magnetization in the α-PLD-grown CFO thin films as compared to those deposited using normal-incidence PLD. Such significantly enhanced magnetic coercivity observed in CFO thin films make them ideally suited for magnetic data storage applications. A growth mechanism based on the atomic shadowing effect and strain compression-relaxation mechanism was proposed for the obliquely grown CFO thin films.

  7. Metallic atomically-thin layered silicon epitaxially grown on silicene/ZrB2

    DOE PAGES

    Gill, Tobias; Fleurence, Antoine; Warner, Ben; ...

    2017-01-19

    We observe a new two-dimensional (2D) silicon crystal, using low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM) and it's formed by depositing additional Si atoms onto spontaneously-formed epitaxial silicene on a ZrB2 thin film. From scanning tunnelling spectroscopy (STS) studies, we find that this atomically-thin layered silicon has distinctly different electronic properties. Angle resolved photoelectron spectroscopy (ARPES) reveals that, in sharp contrast to epitaxial silicene, the layered silicon exhibits significantly enhanced density of states at the Fermi level resulting from newly formed metallic bands. Furthermore, the 2D growth of this material could allow for direct contacting to themore » silicene surface and demonstrates the dramatic changes in electronic structure that can occur by the addition of even a single monolayer amount of material in 2D systems.« less

  8. On the wetting behavior of ceria thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Fu, Sin-Pui; Rossero, Jorge; Chen, Chen; Li, Daniel; Takoudis, Christos G.; Abiade, Jeremiah T.

    2017-02-01

    Polymers are most widely used in the production of water-repellant coatings. However, their use in applications requiring wear resistance or high-temperature stability is extremely limited. A recent report suggests that wear resistant, thermally stable rare earth oxide materials like cerium dioxide (ceria) are intrinsically water repellant. We have studied this intriguing finding for ceria thin films fabricated by pulsed laser deposition (PLD) at different oxygen pressures and different substrate temperatures. We used a custom apparatus for measuring water contact angles on ceria films deposited by PLD. X-ray photoelectron spectroscopy was used to determine the relationship between the ceria wetting behavior and ceria surface chemistry. Our results show that ceria thin films are intrinsically hydrophilic and that hydrophobicity arises due to adsorption of hydrocarbon species after ˜24 h.

  9. Metallic atomically-thin layered silicon epitaxially grown on silicene/ZrB 2

    DOE PAGES

    Gill, Tobias G.; Fleurence, Antoine; Warner, Ben; ...

    2017-02-17

    We observe a new two-dimensional (2D) silicon crystal, using low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM) and it's formed by depositing additional Si atoms onto spontaneously-formed epitaxial silicene on a ZrB2 thin film. From scanning tunnelling spectroscopy (STS) studies, we find that this atomically-thin layered silicon has distinctly different electronic properties. Angle resolved photoelectron spectroscopy (ARPES) reveals that, in sharp contrast to epitaxial silicene, the layered silicon exhibits significantly enhanced density of states at the Fermi level resulting from newly formed metallic bands. Furthermore, the 2D growth of this material could allow for direct contacting to themore » silicene surface and demonstrates the dramatic changes in electronic structure that can occur by the addition of even a single monolayer amount of material in 2D systems.« less

  10. Modeling the transport properties of epitaxially grown thermoelectric oxide thin films using spectroscopic ellipsometry

    NASA Astrophysics Data System (ADS)

    Sarath Kumar, S. R.; Abutaha, Anas I.; Hedhili, M. N.; Alshareef, H. N.

    2012-01-01

    The influence of oxygen vacancies on the transport properties of epitaxial thermoelectric (Sr,La)TiO3 thin films is determined using electrical and spectroscopic ellipsometry (SE) measurements. Oxygen vacancy concentration was varied by ex-situ annealing in Ar and Ar/H2. All films exhibited degenerate semiconducting behavior, and electrical conductivity decreased (258-133 S cm-1) with increasing oxygen content. Similar decrease in the Seebeck coefficient is observed and attributed to a decrease in effective mass (7.8-3.2 me), as determined by SE. Excellent agreement between transport properties deduced from SE and direct electrical measurements suggests that SE is an effective tool for studying oxide thin film thermoelectrics.

  11. HfSe2 thin films: 2D transition metal dichalcogenides grown by molecular beam epitaxy.

    PubMed

    Yue, Ruoyu; Barton, Adam T; Zhu, Hui; Azcatl, Angelica; Pena, Luis F; Wang, Jian; Peng, Xin; Lu, Ning; Cheng, Lanxia; Addou, Rafik; McDonnell, Stephen; Colombo, Luigi; Hsu, Julia W P; Kim, Jiyoung; Kim, Moon J; Wallace, Robert M; Hinkle, Christopher L

    2015-01-27

    In this work, we demonstrate the growth of HfSe2 thin films using molecular beam epitaxy. The relaxed growth criteria have allowed us to demonstrate layered, crystalline growth without misfit dislocations on other 2D substrates such as highly ordered pyrolytic graphite and MoS2. The HfSe2 thin films exhibit an atomically sharp interface with the substrates used, followed by flat, 2D layers with octahedral (1T) coordination. The resulting HfSe2 is slightly n-type with an indirect band gap of ∼ 1.1 eV and a measured energy band alignment significantly different from recent DFT calculations. These results demonstrate the feasibility and significant potential of fabricating 2D material based heterostructures with tunable band alignments for a variety of nanoelectronic and optoelectronic applications.

  12. Metallic atomically-thin layered silicon epitaxially grown on silicene/ZrB2

    NASA Astrophysics Data System (ADS)

    Gill, Tobias G.; Fleurence, Antoine; Warner, Ben; Prüser, Henning; Friedlein, Rainer; Sadowski, Jerzy T.; Hirjibehedin, Cyrus F.; Yamada-Takamura, Yukiko

    2017-06-01

    Using low energy electron diffraction (LEED) and scanning tunnelling microscopy (STM), we observe a new two-dimensional (2D) silicon crystal that is formed by depositing additional Si atoms onto spontaneously-formed epitaxial silicene on a ZrB2 thin film. From scanning tunnelling spectroscopy (STS) studies, we find that this atomically-thin layered silicon has distinctly different electronic properties. Angle resolved photoelectron spectroscopy (ARPES) reveals that, in sharp contrast to epitaxial silicene, the layered silicon exhibits significantly enhanced density of states at the Fermi level resulting from newly formed metallic bands. The 2D growth of this material could allow for direct contacting to the silicene surface and demonstrates the dramatic changes in electronic structure that can occur by the addition of even a single monolayer amount of material in 2D systems.

  13. MOCVD Grown InP and Related Thin Films on Silicon Substrates for Electron and Photonic Devices Applications

    NASA Astrophysics Data System (ADS)

    Zhong, Zhenyu

    Heterogeneous integration of III-V compound semiconductor with silicon is attracting renewed attention in recent years due to its potential in electronic and photonic applications. For electronic applications, a robust integration allows low-voltage and high-speed III-V based transistors to couple with mature silicon-based technologies for functional circuit blocks. Several successful demonstrations have been achieved by molecular beam epitaxy (MBE). In regard to photonic applications, silicon photonics is an important area of research with its possible replacement of copper interconnects. The well-developed III-V photonic devices can be utilized on a silicon platform if a seamless integration can be realized. This concept has been extensively demonstrated by wafer bonding, whereas the manufacturing complexity, reliability and yield are main challenges in this transfer technique. In this thesis, demonstration of heterogeneous integration of III-V based electron and photonic devices on silicon substrates is described, using Metal organic chemical vapor deposition (MOCVD), which is considered more compatible with CMOS processes with good potential for wafer level manufacturing. In this work, InP thin films with smooth surface morphology were firstly achieved by introducing thin GaAs buffer layers. The GaAs buffer was optimized based on the surface morphology, crystalline quality and in situ RAS signal. The total thickness of the buffer layer was finally reduced to 1.2mum by trimming the GaAs buffers as a thin buffer is more desirable for process integration. On top of the thin InP buffer layers, high performance metamorphic high electron mobility transistors (mHEMTs) have been demonstrated for the first time. To implement photonic devices on the buffers, the epitaxial films quality was further improved utilizing novel post-treatment techniques, including thermal process and strained layers for defects reduction. InGaAs p-i-n photodetectors lattice-matched to In

  14. Paramagnetic dysprosium-doped zinc oxide thin films grown by pulsed-laser deposition

    SciTech Connect

    Lo, Fang-Yuh Ting, Yi-Chieh; Chou, Kai-Chieh; Hsieh, Tsung-Chun; Ye, Cin-Wei; Hsu, Yung-Yuan; Liu, Hsiang-Lin; Chern, Ming-Yau

    2015-06-07

    Dysprosium(Dy)-doped zinc oxide (Dy:ZnO) thin films were fabricated on c-oriented sapphire substrate by pulsed-laser deposition with doping concentration ranging from 1 to 10 at. %. X-ray diffraction (XRD), Raman-scattering, optical transmission spectroscopy, and spectroscopic ellipsometry revealed incorporation of Dy into ZnO host matrix without secondary phase. Solubility limit of Dy in ZnO under our deposition condition was between 5 and 10 at. % according to XRD and Raman-scattering characteristics. Optical transmission spectroscopy and spectroscopic ellipsometry also showed increase in both transmittance in ultraviolet regime and band gap of Dy:ZnO with increasing Dy density. Zinc vacancies and zinc interstitials were identified by photoluminescence spectroscopy as the defects accompanied with Dy incorporation. Magnetic investigations with a superconducting quantum interference device showed paramagnetism without long-range order for all Dy:ZnO thin films, and a hint of antiferromagnetic alignment of Dy impurities was observed at highest doping concentration—indicating the overall contribution of zinc vacancies and zinc interstitials to magnetic interaction was either neutral or toward antiferromagnetic. From our investigations, Dy:ZnO thin films could be useful for spin alignment and magneto-optical applications.

  15. Properties of anodic oxides grown on a hafnium–tantalum–titanium thin film library

    PubMed Central

    Mardare, Andrei Ionut; Ludwig, Alfred; Savan, Alan; Hassel, Achim Walter

    2014-01-01

    A ternary thin film combinatorial materials library of the valve metal system Hf–Ta–Ti obtained by co-sputtering was studied. The microstructural and crystallographic analysis of the obtained compositions revealed a crystalline and textured surface, with the exception of compositions with Ta concentration above 48 at.% which are amorphous and show a flat surface. Electrochemical anodization of the composition spread thin films was used for analysing the growth of the mixed surface oxides. Oxide formation factors, obtained from the potentiodynamic anodization curves, as well as the dielectric constants and electrical resistances, obtained from electrochemical impedance spectroscopy, were mapped along two dimensions of the library using a scanning droplet cell microscope. The semiconducting properties of the anodic oxides were mapped using Mott–Schottky analysis. The degree of oxide mixing was analysed qualitatively using x-ray photoelectron spectroscopy depth profiling. A quantitative analysis of the surface oxides was performed and correlated to the as-deposited metal thin film compositions. In the concurrent transport of the three metal cations during oxide growth a clear speed order of Ti > Hf > Ta was proven. PMID:27877648

  16. Paramagnetic dysprosium-doped zinc oxide thin films grown by pulsed-laser deposition

    NASA Astrophysics Data System (ADS)

    Lo, Fang-Yuh; Ting, Yi-Chieh; Chou, Kai-Chieh; Hsieh, Tsung-Chun; Ye, Cin-Wei; Hsu, Yung-Yuan; Chern, Ming-Yau; Liu, Hsiang-Lin

    2015-06-01

    Dysprosium(Dy)-doped zinc oxide (Dy:ZnO) thin films were fabricated on c-oriented sapphire substrate by pulsed-laser deposition with doping concentration ranging from 1 to 10 at. %. X-ray diffraction (XRD), Raman-scattering, optical transmission spectroscopy, and spectroscopic ellipsometry revealed incorporation of Dy into ZnO host matrix without secondary phase. Solubility limit of Dy in ZnO under our deposition condition was between 5 and 10 at. % according to XRD and Raman-scattering characteristics. Optical transmission spectroscopy and spectroscopic ellipsometry also showed increase in both transmittance in ultraviolet regime and band gap of Dy:ZnO with increasing Dy density. Zinc vacancies and zinc interstitials were identified by photoluminescence spectroscopy as the defects accompanied with Dy incorporation. Magnetic investigations with a superconducting quantum interference device showed paramagnetism without long-range order for all Dy:ZnO thin films, and a hint of antiferromagnetic alignment of Dy impurities was observed at highest doping concentration—indicating the overall contribution of zinc vacancies and zinc interstitials to magnetic interaction was either neutral or toward antiferromagnetic. From our investigations, Dy:ZnO thin films could be useful for spin alignment and magneto-optical applications.

  17. Structural, optical and electrical properties of Sn x S y thin films grown by spray ultrasonic

    NASA Astrophysics Data System (ADS)

    Kherchachi, I. B.; Attaf, A.; Saidi, H.; Bouhdjer, A.; Bendjedidi, H.; Benkhetta, Y.; Azizi, R.

    2016-03-01

    Tin sulfide (Sn x S y ) thin films were prepared by a spray ultrasonic technique on glass substrate at 300 °C. The influence of deposition time t = 2, 4, 6, 8 and 10 min on different properties of thin films, such as (XRD), photoluminescence (PL) and (UV) spectroscopy visible spectrum and four-point were investigated. X-ray diffraction showed that thin films crystallized in SnS2, SnS, and Sn2S3 phases, but the most prominent one is SnS2. The results of the (UV) spectroscopy visible spectrum show that the film which was deposited at 4 min has a large transmittance of 60% in the visible region. The photoluminescence spectra exhibited the luminescent peaks in the visible region, which shows its potential application in photovoltaic devices. The electrical resistivity (ρ) values of Sn x S y films have changed from 8.1 × 10-4 to 1.62 Ω·cm with deposition time.

  18. Properties of anodic oxides grown on a hafnium-tantalum-titanium thin film library

    NASA Astrophysics Data System (ADS)

    Ionut Mardare, Andrei; Ludwig, Alfred; Savan, Alan; Hassel, Achim Walter

    2014-02-01

    A ternary thin film combinatorial materials library of the valve metal system Hf-Ta-Ti obtained by co-sputtering was studied. The microstructural and crystallographic analysis of the obtained compositions revealed a crystalline and textured surface, with the exception of compositions with Ta concentration above 48 at.% which are amorphous and show a flat surface. Electrochemical anodization of the composition spread thin films was used for analysing the growth of the mixed surface oxides. Oxide formation factors, obtained from the potentiodynamic anodization curves, as well as the dielectric constants and electrical resistances, obtained from electrochemical impedance spectroscopy, were mapped along two dimensions of the library using a scanning droplet cell microscope. The semiconducting properties of the anodic oxides were mapped using Mott-Schottky analysis. The degree of oxide mixing was analysed qualitatively using x-ray photoelectron spectroscopy depth profiling. A quantitative analysis of the surface oxides was performed and correlated to the as-deposited metal thin film compositions. In the concurrent transport of the three metal cations during oxide growth a clear speed order of Ti > Hf > Ta was proven.

  19. X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition.

    PubMed

    Kleiman, A; Lamas, D G; Craievich, A F; Márquez, A

    2014-05-01

    TiO2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves--which exhibited a wide angular range of oscillatory behavior--the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO2 layer over which a very thin H2O layer is adsorbed. The thickest H2O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM).

  20. Thermal and irradiation induced interdiffusion in magnetite thin films grown on magnesium oxide (0 0 1) substrates

    NASA Astrophysics Data System (ADS)

    Kim-Ngan, N.-T. H.; Balogh, A. G.; Meyer, J. D.; Brötz, J.; Zając, M.; Ślęzak, T.; Korecki, J.

    2009-05-01

    Epitaxial Fe 3O 4(0 0 1) thin films (with a thickness in the range of 10-20 nm) grown on MgO substrates were characterized using low-energy electron diffraction (LEED), conversion electron Mössbauer spectroscopy (CEMS) and investigated using Rutherford backscattering spectrometry (RBS), channeling (RBS-C) experiments and X-ray reflectometry (XRR). The Mg out-diffusion from the MgO substrate into the film was observed for the directly-deposited Fe 3O 4/MgO(0 0 1) films. For the Fe 3O 4/Fe/MgO(0 0 1) films, the Mg diffusion was prevented by the Fe layer and the surface layer is always a pure Fe 3O 4 layer. Annealing and ion beam mixing induced a very large interface zone having a spinel and/or wustite formula in the Fe 3O 4-on-Fe film system.

  1. Perpendicular Magnetic Anisotropy and Spin Glass-like Behavior in Molecular Beam Epitaxy Grown Chromium Telluride Thin Films.

    PubMed

    Roy, Anupam; Guchhait, Samaresh; Dey, Rik; Pramanik, Tanmoy; Hsieh, Cheng-Chih; Rai, Amritesh; Banerjee, Sanjay K

    2015-04-28

    Reflection high-energy electron diffraction (RHEED), scanning tunneling microscopy (STM), vibrating sample magnetometry, and other physical property measurements are used to investigate the structure, morphology, magnetic, and magnetotransport properties of (001)-oriented Cr2Te3 thin films grown on Al2O3(0001) and Si(111)-(7×7) surfaces by molecular beam epitaxy. Streaky RHEED patterns indicate flat smooth film growth on both substrates. STM studies show the hexagonal arrangements of surface atoms. Determination of the lattice parameter from the atomically resolved STM image is consistent with the bulk crystal structures. Magnetic measurements show the film is ferromagnetic, having a Curie temperature of about 180 K, and a spin glass-like behavior was observed below 35 K. Magnetotransport measurements show the metallic nature of the film with a perpendicular magnetic anisotropy along the c-axis.

  2. Morphology of TiN thin films grown on MgO(001) by reactive dc magnetron sputtering

    SciTech Connect

    Ingason, A. S.; Magnus, F.; Olafsson, S.; Gudmundsson, J. T.

    2010-07-15

    Thin TiN films were grown by reactive dc magnetron sputtering on single-crystalline MgO(001) substrates at a range of temperatures from room temperature to 600 deg. C. Structural characterization was carried out using x-ray diffraction and reflection methods. TiN films grow epitaxially on the MgO substrates at growth temperatures of 200 deg. C and above. The crystal coherence length determined from Laue oscillations and the Scherrer method agrees with x-ray reflection thickness measurements to 6% and within 3% for growth temperatures of 200 and 600 deg. C, respectively. For lower growth temperatures the films are polycrystalline but highly textured and porous.

  3. Dislocation densities reduction in MBE-grown AlN thin films by high-temperature annealing

    NASA Astrophysics Data System (ADS)

    Nemoz, Maud; Dagher, Roy; Matta, Samuel; Michon, Adrien; Vennéguès, Philippe; Brault, Julien

    2017-03-01

    AlN thin films, grown on (0001) sapphire substrates by molecular beam epitaxy (MBE), were annealed at high temperature (up to 1650 °C) in flowing N2. X-ray diffraction (XRD) studies, combined with Williamson-Hall and Srikant plots, have shown that annealing leads to a strong reduction of both edge and mixed threading dislocation densities, as confirmed by transmission electron microscopy (TEM) images, up to 75%. Moreover, it is found that annealing at high temperatures allows the relaxation of the tensile strain in the AlN film due to the growth process. In addition, the morphological properties of the films were determined by atomic force microscopy (AFM) and show that the annealing conditions have a strong impact on the surface morphology and roughness. Finally, an annealing at 1550 °C for 20 min appears as an ideal tradeoff to enhance the structural properties while preserving the initial AlN surface morphology.

  4. Reliable thin film encapsulation for organic light emitting diodes grown by low-temperature atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Meyer, J.; Schneidenbach, D.; Winkler, T.; Hamwi, S.; Weimann, T.; Hinze, P.; Ammermann, S.; Johannes, H.-H.; Riedl, T.; Kowalsky, W.

    2009-06-01

    We report on highly efficient gas diffusion barriers for organic light emitting diodes (OLEDs). Nanolaminate (NL) structures composed of alternating Al2O3 and ZrO2 sublayers grown by atomic layer deposition at 80 °C are used to realize long-term stable OLED devices. While the brightness of phosphorescent p-i-n OLEDs sealed by a single Al2O3 layer drops to 85% of the initial luminance of 1000 cd/m2 after 1000 h of continuous operation, OLEDs encapsulated with the NL retain more than 95% of their brightness. An extrapolated device lifetime substantially in excess of 10 000 h can be achieved, clearly proving the suitability of the NLs as highly dense and reliable thin film encapsulation of sensitive organic electronic devices.

  5. Single-crystal cubic boron nitride thin films grown by ion-beam-assisted molecular beam epitaxy

    SciTech Connect

    Hirama, Kazuyuki Taniyasu, Yoshitaka; Karimoto, Shin-ichi; Krockenberger, Yoshiharu; Yamamoto, Hideki

    2014-03-03

    We investigated the formation of cubic boron nitride (c-BN) thin films on diamond (001) and (111) substrates by ion-beam-assisted molecular beam epitaxy (MBE). The metastable c-BN (sp{sup 3}-bonded BN) phase can be epitaxially grown as a result of the interplay between competitive phase formation and selective etching. We show that a proper adjustment of acceleration voltage for N{sub 2}{sup +} and Ar{sup +} ions is a key to selectively discriminate non-sp{sup 3} BN phases. At low acceleration voltage values, the sp{sup 2}-bonded BN is dominantly formed, while at high acceleration voltages, etching dominates irrespective of the bonding characteristics of BN.

  6. Electrical property measurements of Cr-N codoped TiO2 epitaxial thin films grown by pulsed laser deposition

    SciTech Connect

    Jacimovic, J; Gaal, R; Magrez, Arnaud; Forro, Laszlo; Regmi, Murari; Eres, Gyula

    2013-01-01

    The temperature dependent resistivity and thermo-electric power of Cr-N codoped TiO2 were compared with that of single element N and Cr doped and undoped TiO2 using epitaxial anatase thin films grown by pulsed laser deposition on (100) LaAlO3 substrates. The resistivity plots and especially the thermoelectric power data confirm that codoping is not a simple sum of single element doping. However, the negative sign of the Seebeck coefficient indicates electron dominated transport independent of doping. The narrowing distinction among the effects of different doping methods combined with increasing resistivity of the films with improving crystalline quality of TiO2 suggest that structural defects play a critical role in the doping process.

  7. Synthesis of nanocrystalline Cu2ZnSnS4 thin films grown by the spray-pyrolysis technique

    NASA Astrophysics Data System (ADS)

    Chandel, Tarun; Singh, Joginder; Rajaram, P.

    2015-08-01

    Spray pyrolysis was used to deposit Cu2ZnSnS4 (CZTS) thin films on soda lime glass substrates at 300 °C. Aqueous solutions of copper chloride, zinc chloride, stannous chloride and thiourea were mixed together to form the spray liquid. The sprayed films were annealed under vacuum at 350 °C, 400 °C and 450 °C. Structural and optical characterization was performed on the CZTS films using X-ray diffraction (XRD) and UV-VIS spectrophotometry. XRD results indicate that the films are single phase nanocrystalline CZTS. Optical studies show that the optical gap values are 1.44 eV for the as-grown film and 1.46 eV, 1.48 eV and 1.49 eV for the films annealed at 350 °C, 400 °C and 450 °C, respectively.

  8. Study of optical and structural properties of CZTS thin films grown by co-evaporation and spray pyrolysis

    NASA Astrophysics Data System (ADS)

    Moreno, R.; Ramirez, E. A.; Gordillo Guzmán, G.

    2016-02-01

    Results regarding optical and structural properties of Cu2ZnSnS4 (CZTS) thin films prepared by co-evaporation using a novel procedure are compared with those obtained with CZTS films grown using a solution based route. The lattice strain ε and crystallite size D of CZTS films prepared by co-evaporation and by spray pyrolysis were estimated through X-ray diffraction (XRD) measurements using Williamson-Hall-isotropic strain model. The results of estimated average crystallite size of CZTS films by Scherrer and Williamson-Hall plot methods were compared with AFM (atomic force microscopy) measurements. It was found that the average crystallite size measured by Williamson-Hall plot methods agree quite well with AFM results. Further, information regarding the influence of preparation method on both, crystalline phases and the formation of structural defects was achieved through Raman and Urbach energy measurements.

  9. Low-damping sub-10-nm thin films of lutetium iron garnet grown by molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Jermain, C. L.; Paik, H.; Aradhya, S. V.; Buhrman, R. A.; Schlom, D. G.; Ralph, D. C.

    2016-11-01

    We analyze the structural and magnetic characteristics of (111)-oriented lutetium iron garnet (Lu3Fe5O12) films grown by molecular-beam epitaxy, for films as thin as 2.8 nm. Thickness-dependent measurements of the in- and out-of-plane ferromagnetic resonance allow us to quantify the effects of two-magnon scattering, along with the surface anisotropy and the saturation magnetization. We achieve effective damping coefficients of 11.1 (9 )×10-4 for 5.3 nm films and 32 (3 )×10-4 for 2.8 nm films, among the lowest values reported to date for any insulating ferrimagnetic sample of comparable thickness.

  10. Phase-coherent electron transport in (Zn, Al)O{sub x} thin films grown by atomic layer deposition

    SciTech Connect

    Saha, D. E-mail: pmisra@rrcat.gov.in; Misra, P. E-mail: pmisra@rrcat.gov.in; Ajimsha, R. S.; Joshi, M. P.; Kukreja, L. M.

    2014-11-24

    A clear signature of disorder induced quantum-interference phenomena leading to phase-coherent electron transport was observed in (Zn, Al)O{sub x} thin films grown by atomic layer deposition. The degree of static-disorder was tuned by varying the Al concentration through periodic incorporation of Al{sub 2}O{sub 3} sub-monolayer in ZnO. All the films showed small negative magnetoresistance due to magnetic field suppressed weak-localization effect. The temperature dependence of phase-coherence length (l{sub φ}∝T{sup −3/4}), as extracted from the magnetoresistance measurements, indicated electron-electron scattering as the dominant dephasing mechanism. The persistence of quantum-interference at relatively higher temperatures up to 200 K is promising for the realization of ZnO based phase-coherent electron transport devices.

  11. Spin-resolved photoemission study of epitaxially grown MoSe 2 and WSe 2 thin films

    DOE PAGES

    Mo, Sung-Kwan; Hwang, Choongyu; Zhang, Yi; ...

    2016-09-12

    Few-layer thick MoSe2 and WSe2 possess non-trivial spin textures with sizable spin splitting due to the inversion symmetry breaking embedded in the crystal structure and strong spin–orbit coupling. Here, we report a spin-resolved photoemission study of MoSe2 and WSe2 thin film samples epitaxially grown on a bilayer graphene substrate. Furthermore, we only found spin polarization in the single- and trilayer samples—not in the bilayer sample—mostly along the out-of-plane direction of the sample surface. The measured spin polarization is found to be strongly dependent on the light polarization as well as the measurement geometry, which reveals intricate coupling between the spinmore » and orbital degrees of freedom in this class of material.« less

  12. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  13. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2002-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  14. Structural, morphological and optical characterizations of ZnO:Al thin films grown on silicon substrates by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Alyamani, A.; Sayari, A.; Albadri, A.; Albrithen, H.; El Mir, L.

    2016-09-01

    The pulsed laser deposition (PLD) technique is used to grow Al-doped ZnO (AZO) thin films at 500 ° C on silicon substrates under vacuum or oxygen gas background from ablating AZO nanoparticle targets synthesized via the sol-gel process. The structural, morphological and optical properties were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM) and spectroscopic ellipsometry (SE) techniques. XRD and TEM images show that AZO powder has a wurtzite-type structure and is composed of small prismatic-like shape nanoparticles with an average size of 30nm. The structural properties of the AZO films grown under oxygen show no significant changes compared to those of the film grown under vacuum. However, the optical properties show a dependence on the growth conditions of the AZO films. Highly c -axis-oriented AZO thin films were obtained with grain size ˜ 15 nm. The stress in the AZO films is tensile as measured from the c -parameter. The dielectric function, the refractive index and the extinction coefficient as a function of the photon energy for the AZO films were determined by using spectroscopic ellipsometry measurements in the photon energy region from 1 to 6eV. The band gap energy was observed to slightly decrease in the presence of the O2 gas background and this may be attributed to the stress. The surface and volume energy loss functions are calculated and exhibit different behaviors in the energy range 1-6eV. Refractive indices of 1.9-2.1 in the visible region were obtained for the AZO films. Also, the electronic carrier concentration appears to be related to the presence of O2 during the growth process.

  15. Annealing Effect on the Structural and Optical Properties of Sputter-Grown Bismuth Titanium Oxide Thin Films

    PubMed Central

    Alfonso, José E.; Olaya, Jhon J.; Bedoya-Hincapié, Claudia M.; Toudert, Johann; Serna, Rosalia

    2014-01-01

    The aim of this work is to assess the evolution of the structural and optical properties of BixTiyOz films grown by rf magnetron sputtering upon post-deposition annealing treatments in order to obtain good quality films with large grain size, low defect density and high refractive index similar to that of single crystals. Films with thickness in the range of 220–250 nm have been successfully grown. After annealing treatment at 600 °C the films show excellent transparency and full crystallization. It is shown that to achieve larger crystallite sizes, up to 17 nm, it is better to carry the annealing under dry air than under oxygen atmosphere, probably because the nucleation rate is reduced. The refractive index of the films is similar under both atmospheres and it is very high (n =2.5 at 589 nm). However it is still slightly lower than that of the single crystal value due to the polycrystalline morphology of the thin films. PMID:28788626

  16. Effect of RF power density on micro- and macro-structural properties of PECVD grown hydrogenated nanocrystalline silicon thin films

    SciTech Connect

    Gokdogan, Gozde Kahriman; Anutgan, Tamila

    2016-03-25

    This contribution provides the comparison between micro- and macro-structure of hydrogenated nanocrystalline silicon (nc-Si:H) thin films grown by plasma enhanced chemical vapor deposition (PECVD) technique under different RF power densities (P{sub RF}: 100−444 mW/cm{sup 2}). Micro-structure is assessed through grazing angle X-ray diffraction (GAXRD), while macro-structure is followed by surface and cross-sectional morphology via field emission scanning electron microscopy (FE-SEM). The nanocrystallite size (∼5 nm) and FE-SEM surface conglomerate size (∼40 nm) decreases with increasing P{sub RF}, crystalline volume fraction reaches maximum at 162 mW/cm{sup 2}, FE-SEM cross-sectional structure is columnar except for the film grown at 162 mW/cm{sup 2}. The dependence of previously determined ‘oxygen content–refractive index’ correlation on obtained macro-structure is investigated. Also, the effect of P{sub RF} is discussed in the light of plasma parameters during film deposition process and nc-Si:H film growth models.

  17. Effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Wang, Wei-Ying; Jin, Peng; Liu, Gui-Peng; Li, Wei; Liu, Bin; Liu, Xing-Fang; Wang, Zhan-Guo

    2014-08-01

    The effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition was investigated using atomic force microscopy, Raman spectroscopy, and deep ultra-violet photoluminescence (PL) with the excitation wavelength as short as ~ 177 nm. Annealing experiments were carried out in either N2 or vacuum atmosphere with the annealing temperature ranging from 1200 °C to 1600 °C. It is found that surface roughness reduced and compressive strain increased with the annealing temperature increasing in both annealing atmospheres. As to optical properties, a band-edge emission peak at 6.036 eV and a very broad emission band peaking at about 4.7 eV were observed in the photoluminescence spectrum of the as-grown sample. After annealing, the intensity of the band-edge emission peak varied with the annealing temperature and atmosphere. It is also found that a much stronger emission band ranging from 2.5 eV to 4.2 eV is superimposed on the original spectra by annealing in either N2 or vacuum atmosphere. We attribute these deep-level emission peaks to the VAL—ON complex in the AlN material.

  18. Simulation, fabrication and characterization of ZnO based thin film transistors grown by radio frequency magnetron sputtering.

    PubMed

    Singh, Shaivalini; Chakrabarti, P

    2012-03-01

    We report the performance of the thin film transistors (TFTs) using ZnO as an active channel layer grown by radio frequency (RF) magnetron sputtering technique. The bottom gate type TFT, consists of a conventional thermally grown SiO2 as gate insulator onto p-type Si substrates. The X-ray diffraction patterns reveal that the ZnO films are preferentially orientated in the (002) plane, with the c-axis perpendicular to the substrate. A typical ZnO TFT fabricated by this method exhibits saturation field effect mobility of about 0.6134 cm2/V s, an on to off ratio of 102, an off current of 2.0 x 10(-7) A, and a threshold voltage of 3.1 V at room temperature. Simulation of this TFT is also carried out by using the commercial software modeling tool ATLAS from Silvaco-International. The simulated global characteristics of the device were compared and contrasted with those measured experimentally. The experimental results are in fairly good agreement with those obtained from simulation.

  19. Study of structural property of Co ferrite thin film grown by pulsed laser deposition technique

    NASA Astrophysics Data System (ADS)

    Nongjai, Razia; Khan, Shakeel; Ahmad, Hilal; Khan, Imran; Asokan, K.

    2012-06-01

    Thin film of Cobalt Ferrite was deposited on Si (1 0 0) substrate using Pulsed Laser Deposition (PLD) technique. The deposited film was characterized by X-ray Diffraction (XRD), X-ray reflectivity (XRR), Rutherford Backscattering Spectroscopy (RBS) and Raman Spectroscopy and was found to be single phase, textured along (1 1 1) directions and approximately matching the stoichoimetry of the target with negligible strain. The film had a very uniform and flat surface. Raman spectroscopy measurement further confirmed the formation of single phase cubic spinel structure. T2g Raman mode was missing from the spectra which may be due to cation redistribution and crystallite size effect.

  20. Photoresponse in thin films of WO{sub 3} grown by pulsed laser deposition

    SciTech Connect

    Roy Moulik, Samik; Samanta, Sudeshna; Ghosh, Barnali

    2014-06-09

    We report, the photoresponse behaviour of Tungsten trioxide (WO{sub 3}) films of different surface morphology, grown by using pulsed laser deposition (PLD). The Growth parameters for PLD were changed for two substrates SiO{sub 2}/Si (SO) and SrTiO{sub 3} (STO), such a way which, result nanocrystalline film on SO and needle like structured film on STO. The photoresponse is greatly modified in these two films because of two different surface morphologies. The nanocrystalline film (film on SO) shows distinct photocurrent (PC) ON/OFF states when light was turned on/off, the enhancement of PC is ∼27%. Whereas, the film with needle like structure (film on STO) exhibits significantly enhanced persistent photocurrent even in light off condition, in this case, the enhancement of PC ∼ 50% at room temperature at lowest wavelength (λ = 360 nm) at a nominal bias voltage of 0.1 V.

  1. Mechanism of Charge Transport in Cobalt and Iron Phthalocyanine Thin Films Grown by Molecular Beam Epitaxy

    SciTech Connect

    Kumar, Arvind; Samanta, Soumen; Singh, Ajay; Debnath, A. K.; Aswal, D. K.; Gupta, S. K.

    2011-12-12

    Cobalt phthalocyanine (CoPc), iron phthalocyanine (FePc) and their composite (CoPc-FePc) films have been grown by molecular beam epitaxy (MBE). Grazing incidence X-ray diffraction (GIXRD) and scanning electron microscope (SEM) studies showed that composite films has better structural ordering compared to individual CoPc and FePc films. The temperature dependence of resistivity (in the temperature range 25 K- 100 K) showed that composite films are metallic, while individual CoPc and FePc films are in the critical regime of metal-to-insulator (M-I) transition The composite films show very high mobility of 110 cm{sup 2} V{sup -1} s{sup -1} at room temperature i.e. nearly two order of magnitude higher compared to pure CoPc and FePc films.

  2. Thermal characterization of polycrystalline diamond thin film heat spreaders grown on GaN HEMTs

    NASA Astrophysics Data System (ADS)

    Zhou, Yan; Ramaneti, Rajesh; Anaya, Julian; Korneychuk, Svetlana; Derluyn, Joff; Sun, Huarui; Pomeroy, James; Verbeeck, Johan; Haenen, Ken; Kuball, Martin

    2017-07-01

    Polycrystalline diamond (PCD) was grown onto high-k dielectric passivated AlGaN/GaN-on-Si high electron mobility transistor (HEMT) structures, with film thicknesses ranging from 155 to 1000 nm. Transient thermoreflectance results were combined with device thermal simulations to investigate the heat spreading benefit of the diamond layer. The observed thermal conductivity (κDia) of PCD films is one-to-two orders of magnitude lower than that of bulk PCD and exhibits a strong layer thickness dependence, which is attributed to the grain size evolution. The films exhibit a weak temperature dependence of κDia in the measured 25-225 °C range. Device simulation using the experimental κDia and thermal boundary resistance values predicts at best a 15% reduction in peak temperature when the source-drain opening of a passivated AlGaN/GaN-on-Si HEMT is overgrown with PCD.

  3. Enhanced photocatalytic performance in atomic layer deposition grown TiO{sub 2} thin films via hydrogen plasma treatment

    SciTech Connect

    Sasinska, Alexander; Singh, Trilok; Wang, Shuangzhou; Mathur, Sanjay; Kraehnert, Ralph

    2015-01-15

    The authors report the effect of hydrogen plasma treatment on TiO{sub 2} thin films grown by atomic layer deposition as an effective approach for modifying the photoanode materials in order to enhance their photoelectrochemical performance. Hydrogen plasma treated TiO{sub 2} thin films showed an improved absorption in the visible spectrum probably due to surface reduction. XPS analysis confirmed the formation of Ti{sup 3+} states upon plasma treatment. Hydrogen plasma treatment of TiO{sub 2} films enhanced the measured photocurrent densities by a factor of 8 (1 mA/cm{sup 2} at 0.8 V versus normal hydrogen electrode) when compared to untreated TiO{sub 2} (0.12 mA/cm{sup 2}). The enhancement in photocurrent is attributed to the formation of localized electronic states in mid band-gap region, which facilitate efficient separation and transportation of photo excited charge carriers in the UV region of electromagnetic spectrum.

  4. Magnetorefractive effect in the La1-xKxMnO3 thin films grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Sukhorukov, Yu. P.; Telegin, A. V.; Bessonov, V. D.; Gan'shina, E. A.; Kaul', A. R.; Korsakov, I. E.; Perov, N. S.; Fetisov, L. Yu.; Yurasov, A. N.

    2014-10-01

    Thin epitaxial La1-хKхMnO3 films were grown using two-stage procedure. Influence of substitution of La3+ ions with K+ ions on the optical and electrical properties of La1-xKxMnO3 films (х=0.05, 0.10, 0.15 и 0.18) has been studied in detail. A noticeable magnetorefractive effect in the films under study was detected in the infrared range. Magnetorefractive effect as well as transverse magneto-optical Kerr effect and magnetoresistance have the maximum in optimally doped sample with x=0.18 corresponding to the highest Curie temperature. The experimental data for compositions close to optimally doped films are in good agreement with the data calculated in the framework of a theory developed for manganites. The resonance-like contribution to magnetoreflection spectra of manganite films has been observed in the vicinity of the phonon bands. It is shown that magnetic and charge inhomogeneities strongly influence on the magneto-optical effects in films. Thin films of La1-xKxMnO3 with the large values of Kerr and magnetorefractive effect are promising magneto-optical material in the infrared range.

  5. Anomalous thickness-dependent optical energy gap of ALD-grown ultra-thin CuO films

    NASA Astrophysics Data System (ADS)

    Tripathi, T. S.; Terasaki, I.; Karppinen, M.

    2016-11-01

    Usually an inverse square relation between the optical energy gap and the size of crystallites is observed for semiconducting materials due to the strong quantum localization effect. Coulomb attraction that may lead to a proportional dependence is often ignored or considered less important to the optical energy gap when the crystallite size or the thickness of a thin film changes. Here we report a proportional dependence between the optical energy gap and the thickness of ALD-grown CuO thin films due to a strong Coulomb attraction. The ultrathin films deposited in the thickness range of 9-81 nm show a p-type semiconducting behavior when analyzed by Seebeck coefficient and electrical resistivity measurements. The indirect optical energy gap nature of the films is verified from UV-vis spectrophotometric measurements. A progressive increase in the indirect optical energy gap from 1.06 to 1.24 eV is observed with the increase in the thickness of the films. The data are analyzed in the presence of Coulomb attractions using the Brus model. The optical energy gap when plotted against the cubic root of the thickness of the films shows a linear dependence.

  6. Thermoelectric transport and Hall measurements of low defect Sb2Te3 thin films grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Zastrow, S.; Gooth, J.; Boehnert, T.; Heiderich, S.; Toellner, W.; Heimann, S.; Schulz, S.; Nielsch, K.

    2013-03-01

    Sb2Te3 has recently been an object of intensive research since its promising applicability in thermoelectric, in phase-change memory devices and as a topological insulator. In this work, we report highly textured Sb2Te3 thin films, grown by atomic layer deposition on Si/SiO2 wafers based on the reaction of SbCl3 and (Et3Si)2Te. The low deposition temperature at 80 °C allows the pre-patterning of the Sb2Te3 by standard lithography processes. A platform to characterize the Seebeck coefficient S, the electrical conductivity σ as well as the Hall coefficient RH on the same film has been developed. Comparing all temperature-dependent transport properties, three different conductive regions in the temperature range of 50-400 K are found. Room temperature values of S = 146 × 10-6 VK-1, σ = 104 Sm-1 and mobility µ = 270.5 × 10-4 m2 V-1 s-1 are determined. The low carrier concentration in the range of n = 2.4 × 1018 cm-3 at 300 K quantifies the low defect content of the Sb2Te3 thin films.

  7. Multiferroic fluoride BaCoF4 Thin Films Grown Via Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Borisov, Pavel; Johnson, Trent; García-Castro, Camilo; Kc, Amit; Schrecongost, Dustin; Cen, Cheng; Romero, Aldo; Lederman, David

    Multiferroic materials exhibit exciting physics related to the simultaneous presence of multiple long-range orders, in many cases consisting of antiferromagnetic (AF) and ferroelectric (FE) orderings. In order to provide a new, promising route for fluoride-based multiferroic material engineering, we grew multiferroic fluoride BaCoF4 in thin film form on Al2O3 (0001) substrates by molecular beam epitaxy. The films grow with the orthorhombic b-axis out-of-plane and with three in-plane structural twin domains along the polar c-axis directions. The FE ordering in thin films was verified by FE remanent hysteresis loops measurements at T = 14 K and by room temperature piezoresponse force microscopy (PFM). An AF behavior was found below Neel temperature TN ~ 80 K, which is in agreement with the bulk properties. At lower temperatures two additional magnetic phase transitions at 19 K and 41 K were found. First-principles calculations demonstrated that the growth strain applied to the bulk BaCoF4 indeed favors two canted spin orders, along the b- and a-axes, respectively, in addition to the main AF spin order along the c-axis. Supported by FAME (Contract 2013-MA-2382), WV Research Challenge Grant (HEPC.dsr.12.29), and DMREF-NSF 1434897.

  8. Properties of ZrB2 Thin Films Grown by E-Beam Evaporation

    NASA Astrophysics Data System (ADS)

    Lad, Robert; Stewart, David; Sell, Julia; Bernhardt, George; Frankel, David; University of Maine Team

    2014-03-01

    Zirconium diboride (ZrB2) is a candidate material for many high temperature applications because it has a high melting point, high hardness, thermal shock resistance, and metallic conductivity. However, very little work has been reported concerning growth of ZrB2 thin films and high temperature oxidation behavior. In this study, ZrB2 films with nominal thickness of 200 nm have been deposited using electron-beam evaporation of either ZrB2 pellets or elemental B and Zr sources. The ZrB2 source yields a film that has a 1:1 Zr:B average composition as measured by X-ray photoelectron spectroscopy, consisting of ZrB2 precipitates within an amorphous Zr matrix as determined by X-ray diffraction. Use of elemental B and Zr sources allows precise control of film growth over a range of stoichiometries and yields ZrB2 films with much lower oxygen contamination. After annealing ZrB2 films to 1200°C in air, oxidation leads to a loss of B and formation of a textured monoclinic ZrO2 phase. Several strategies, including deposition of a thin Al2O3 capping layer over the ZrB2 film are being pursued in an attempt to stabilize the electrically conductive ZrB2 phase at high temperature, where it can be used for high temperature electronic devices in harsh environments. Supported by NSF grant # 1309983.

  9. Reduced Cu concentration in CuAl-LPE-grown thin Si layers

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Asher, S.; Reedy, R.

    1995-08-01

    Cu-Al has been found to be a good solvent system to grow macroscopically smooth Si layers with thicknesses in tens of microns on cast MG-Si substrates by liquid phase epitaxy (LPE) at temperatures near 900{degrees}C. This solvent system utilizes Al to ensure good wetting between the solution and substrate by removing silicon native oxides, and employs Cu to control Al doping into the layers. Isotropic growth is achieved because of a high concentration of solute silicon in the solution and the resulting microscopically rough interface. The incorporation of Cu in the Si layers, however, was a concern since Cu is a major solution component and is generally regarded as a bad impurity for silicon devices due to its fast diffusivity and deep energy levels in the band gap. A study by Davis shows that Cu will nonetheless not degrade solar cell performance until above a level of 10{sup 17} cm{sup -3}. This threshold is expected to be even higher for thin layer silicon solar cells owing to the less stringent requirement on minority carrier diffusion length. But to ensure long term stability of solar cells, lower Cu concentrations in the thin layers are still preferred.

  10. Advanced APCVD-processes for high-temperature grown crystalline silicon thin film solar cells.

    PubMed

    Driessen, Marion; Merkel, Benjamin; Reber, Stefan

    2011-09-01

    Crystalline silicon thin film (cSiTF) solar cells based on the epitaxial wafer-equivalent (EpiWE) concept combine advantages of wafer-based and thin film silicon solar cells. In this paper two processes beyond the standard process sequence for cSiTF cell fabrication are described. The first provides an alternative to wet chemical saw damage removal by chemical vapor etching (CVE) with hydrogen chloride in-situ prior to epitaxial deposition. This application decreases the number of process and handling steps. Solar cells fabricated with different etching processes achieved efficiencies up to 14.7%. 1300 degrees C etching temperature led to better cell results than 1200 degrees C. The second investigated process aims for an improvement of cell efficiency by implementation of a reflecting interlayer between substrate and active solar cell. Some characteristics of epitaxial lateral overgrowth (ELO) of a patterned silicon dioxide film in a lab-type reactor constructed at Fraunhofer ISE are described and first solar cell results are presented.

  11. Secondary electron emission characteristics of a thermally grown SiO2 thin layer on Si

    NASA Astrophysics Data System (ADS)

    Jeong, Taewon; Yu, Segi; Jin, S. H.; Lee, Jeonghee; Yi, Whikun; Choi, Y. S.; Kim, J. M.; Jeon, D.

    2000-03-01

    The secondary electron emissions of thin SiO2 layers prepared by dry thermal oxidation of doped Si substrates were measured as a function of the oxide layer thickness and the dopant element. The oxide layer thickness was varied between 200 A and 1150 A by changing the oxidation time at 930 C. We found that secondary electron emission yield curves for the samples with a relatively thick oxide layer revealed two local maxima (one near 300 - 500 eV, the other near 1000 eV) regardless of the dopant type, while those for the samples with a relatively thin layer showed one maximum like many other previous results. When the oxide layer was formed by vapor deposition, the two peaks were not observed. This leads us to interpret the secondary electron emission data for the thermally oxidized samples in terms of the dopant accumulation and the electron tunneling through the narrow barrier at the Si/SiO2 interface. Sample characterization data and a simple phenomenological model will be presented. This work was supported by the Korean Ministry of Science and Technology through the Creative Research Initiative program.

  12. Random lasing of ZnO thin films grown by pulsed-laser deposition

    NASA Astrophysics Data System (ADS)

    Cachoncinlle, C.; Hebert, C.; Perrière, J.; Nistor, M.; Petit, A.; Millon, E.

    2015-05-01

    Low-dimensional semiconductor structures on nanometer scale are of great interest because of their strong potential applications in nanotechnologies. We report here optical and structural properties on UV lasing in ZnO thin films. The ZnO films, 110 nm thick, were prepared using pulsed-laser deposition on c-cut sapphire substrates at 500 °C under 10-2 oxygen pressure. The ZnO films are nearly stoichiometric, dense and display the wurtzite phase. The films are highly textured along the ZnO c-axis and are constituted of nanocrystallites. According to Hall measurements these films are conductive (0.11 Ω cm). Photoluminescence measurements reveals a so-called random lasing in the range 390 to 410 nm, when illuminating at 355 nm with a tripled frequency pulsed Nd-YAG laser. Such random lasing is obtained at rather low optical pumping, 45 kW cm-2, a value lower than those classically reported for pulsed-laser deposition thin films.

  13. Biocompatible Mn2+-doped carbonated hydroxyapatite thin films grown by pulsed laser deposition.

    PubMed

    György, E; Toricelli, P; Socol, G; Iliescu, M; Mayer, I; Mihailescu, I N; Bigi, A; Werckman, J

    2004-11-01

    Mn(2+)-doped carbonated hydroxyapatite (Mn-CHA) thin films were obtained by pulsed laser deposition on Ti substrates. The results of the performed complementary diagnostic techniques, X-ray diffraction, infrared spectroscopy, X-ray photoelectron spectroscopy, and energy dispersive X-ray spectroscopy investigations indicate that the films are crystalline with a Ca/P ratio of about 1.64-1.66. The optimum conditions, when nearly stoichiometric crystalline thin films were deposited, were found to be 10 Pa oxygen pressure, 400 degrees C substrate temperature, and postdeposition heat treatment in water vapors at the same substrate temperature. The films were seeded with L929 fibroblast and hFOB1.19 osteoblast cells and subjected to in vitro tests. Both fibroblast and osteoblast cells have a good adherence on the Mn-CHA film and on the Ti or polystyrene references. Proliferation and viability tests showed that osteoblast cells growth on Mn-CHA-coated Ti was enhanced as compared to uncoated pure Ti surfaces. Caspase-1 activity was not affected significantly by the material, showing that Mn-CHA does not induce apoptosis of cultured cells. These results demonstrate that Mn-CHA films on Ti should provoke a faster osteointegration of the coated implants as compared to pure Ti. (c) 2004 Wiley Periodicals, Inc. J Biomed Mater Res 71A: 353-358, 2004.

  14. Nanostructured and wide bandgap CdS:O thin films grown by reactive RF sputtering

    SciTech Connect

    Islam, M. A.; Rahman, K. S.; Haque, F.; Rashid, M. J.; Akhtaruzzaman, M.; Sopian, K.; Sulaiman, Y.; Amin, N.

    2015-05-15

    In this study, CdS:O thin films were prepared from a 99.999% CdS target by reactive sputtering in a Ar:O{sub 2} (99:1) ambient with different RF power at room temperature. The deposited films were studied by means of XRD, SEM, EDX, Hall Effect and UV-Vis spectrometry. The incorporations of O{sub 2} into the films were observed to increase with the decrease of deposition power. The cryatallinity of the films were reduced, whereas the band gaps of the films were increased by the increase of O{sub 2} content on the films. The films were found in nano-structured grains with a compact surface. It has been seen that the highest carrier density is observed in the film with O{sub 2} at.% 21.10, while the values decreased with the further increase or decrease of O{sub 2} content on the films; indicating that specific amount of donor like O{sub 2} atoms substitute to the S atoms can improve the carrier density of the CdS:O thin film.

  15. Microstructural and Electrical Characterization of Silicon Carbide and Aluminum Nitride Thin Films Grown by Gas-Source Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Kern, Richard Scott

    1996-08-01

    Monocrystalline thin films, multilayered heterostructures and solid solutions of silicon carbide (SiC) and aluminum nitride (AlN) have been grown on alpha(6H) -SiC(0001) substrates by gas-source molecular beam epitaxy. Growth mechanisms, defect formation, donor and acceptor doping, metal-insulator-semiconductor diodes, pseudomorphic heterostructures and solid solutions in these materials have been studied. Monocrystalline films of beta(3C) -SiC(111) and alpha(6H)-SiC(0001) have been controllably deposited on the silicon face of 6H-SiC(0001) substrates. Polytype control was achieved via changes in the substrate orientation, substrate temperature and gas phase chemistry. Step flow growth was achieved on vicinal substrates at growth temperatures of at least 1350^circC using the SiH _4-rm C_2H_4 -H_2 system. Step bunching, cubic SiC nucleation and double positioning boundaries were observed at all temperatures when H_2 was removed from the system or the growth was performed at below 1350^circC. In both cases, growth rate was strongly dependent on temperature. Films doped using either a NH_3/H _2 mixture or pure N_2 were n-type; Al, p-type. Uniform, controllable doping levels between 10^{15} and 10^{19} cm ^{-3} were achieved for both polytypes. The measured mobility in the undoped 6H polytype, 434 cm ^2 V^{-1} s ^{-1}, is the highest reported in this polytype. Monocrystalline AlN was deposited using aluminum evaporated from a modified MBE effusion cell and either activated nitrogen derived from a compact electron cyclotron resonance plasma source or ammonia. Growth using each of the nitrogen sources was optimized with respect to substrate temperature, reactant flux and system pressure. In general, very thin films (<=q50 A) grown on vicinal 6H-SiC had a higher defect density than those grown on nominally on-axis substrates due to defect formation at or near the steps on the SiC surface. Full-width half maximum (FWHM) values of the (0002)_ {AlN} X-ray diffraction Bragg

  16. Effects of Precursor Concentration on Structural and Optical Properties of ZnO Thin Films Grown on Muscovite Mica Substrates by Sol-Gel Spin-Coating.

    PubMed

    Kim, Younggyu; Leem, Jae-Young

    2016-05-01

    The structural and optical properties of the ZnO thin films grown on mica substrates for different precursor concentrations were investigated. The surface morphologies of all the samples indicated that they consisted of granular structures with spherical nano-sized crystallites. The thickness of the ZnO thin films increased significantly and the optical band gap exhibited a blue shift with an increase in the precursor concentration. It is remarkable that the highest I(NBE)/I(DLE) ratio was observed for the ZnO thin film with 0.8 M precursor concentration, even though cracks formed on the surface of this film.

  17. Characterization of ALD grown TixAlyN and TixAlyC thin films

    NASA Astrophysics Data System (ADS)

    Kinnunen, S. A.; Malm, J.; Arstila, K.; Lahtinen, M.; Sajavaara, T.

    2017-09-01

    Atomic layer deposition (ALD) was used to grow TixAlyN and TixAlyC thin films using trimethylaluminum (TMA), titanium tetrachloride and ammonia as precursors. Deposition temperature was varied between 325 °C and 500 °C. Films were also annealed in vacuum and N2-atmosphere at 600-1000 °C. Wide range of characterization methods was used including time-of-flight elastic recoil detection analysis (ToF-ERDA), X-ray diffractometry (XRD), X-ray reflectometry (XRR), Raman spectroscopy, ellipsometry, helium ion microscopy (HIM), atomic force microscopy (AFM) and 4-point probe measurement for resistivity. Deposited films were roughly 100 nm thick and contained mainly desired elements. Carbon, chlorine and hydrogen were found to be the main impurities.

  18. Properties of amorphous silicon thin films grown in square wave modulated silane rf discharges

    NASA Astrophysics Data System (ADS)

    Andújar, J. L.; Bertran, E.; Canillas, A.; Campmany, J.; Serra, J.; Roch, C.; Lloret, A.

    1992-02-01

    Hydrogenated amorphous silicon (a-Si:H) thin films have been obtained from pure SiH4 rf discharges by using the square wave modulation (SQWM) method. Film properties have been studied by means of spectroellipsometry, thermal desorption spectrometry, photothermal deflection spectroscopy and electrical conductivity measurements, as a function of the modulation frequency of the rf power amplitude (0.2-4000 Hz). The films deposited at frequencies about 1 kHz show the best structural and optoelectronic characteristics. Based upon the experimental results, a qualitative model is presented, which points up the importance of plasma negative ions in the deposition of a-Si:H from SQWM rf discharges through their influence on powder particle formation.

  19. Template-controlled piezoactivity of ZnO thin films grown via a bioinspired approach

    PubMed Central

    Blumenstein, Nina J; Streb, Fabian; Walheim, Stefan; Schimmel, Thomas; Bill, Joachim

    2017-01-01

    Biomaterials are used as model systems for the deposition of functional inorganic materials under mild reaction conditions where organic templates direct the deposition process. In this study, this principle was adapted for the formation of piezoelectric ZnO thin films. The influence of two different organic templates (namely, a carboxylate-terminated self-assembled monolayer and a sulfonate-terminated polyelectrolyte multilayer) on the deposition and therefore on the piezoelectric performance was investigated. While the low negative charge of the COOH-SAM is not able to support oriented attachment of the particles, the strongly negatively charged sulfonated polyelectrolyte leads to texturing of the ZnO film. This texture enables a piezoelectric performance of the material which was measured by piezoresponse force microscopy. This study shows that it is possible to tune the piezoelectric properties of ZnO by applying templates with different functionalities. PMID:28243568

  20. Magnetic phases of thin Fe films grown on stepped Cr(001)

    SciTech Connect

    Escorcia-Aparicio, E.J.; Wolfe, J.H.; Choi, H.J.; Ling, W.L.; Kawakami, R.K.; Qiu, Z.Q.

    1999-05-01

    Magnetic phases of Fe films grown on curved Cr(001) with steps parallel to [100] are studied using the surface magneto-optic Kerr effect (SMOKE). We found that the atomic steps (1) induce an in-plane uniaxial magnetic anisotropy with the easy magnetization axis parallel to the step edges, and (2) generate magnetic frustration either inside the Fe film or at the Fe-Cr interface, depending on the Fe film thickness and the vicinal angle. For thickness greater than 35 {Angstrom}, the Fe film forms a single magnetic domain and undergoes an in-plane magnetization switching due to the competition of the step-induced anisotropy and the Fe-Cr interfacial frustration. For thickness less than 35 {Angstrom}, the Fe film forms multiple magnetic domains at low vicinal angle, and transforms into a single domain at high vicinal angle. A magnetic phase diagram in the 30{endash}45 {Angstrom} thickness range was obtained using a wedge-shaped Fe film. {copyright} {ital 1999} {ital The American Physical Society}

  1. Nanoindentation of YSZ-alumina ceramic thin films grown by combustion chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Stollberg, David Walter

    2000-10-01

    Yttria-stabilized zirconia (YSZ), alumina (Al2O 3), and YSZ-Al2O3 composites were deposited onto single crystal a-plane alumina using combustion chemical vapor deposition (CVD). Using an organic liquid as the flammable solvent and Y 2-ethylhexanoate, Zr 2-ethylhexanoate and Al acetylacetonate as the metal precursors in a 0.002 M concentration, films were grown with deposition rates of ˜1.5 mum/hr. The mechanical properties (hardness, elastic modulus and fracture toughness) of the films were measured using nanoindentation. Additions of second phase particles of Al2O3 to YSZ films increased the fracture toughness. Similarly, additions of second phase particles of YSZ to Al 2O3 films also increased the fracture toughness. Modeling of the fracture toughness of the YSZ-Al2O3 films was successfully achieved using the following toughening mechanisms: crack deflection from the second phase particles, grain bridging around the particles and residual stress from the CTE mismatch between the film and the substrate and between the second phase particles and the matrix of the film.

  2. STM studies of GeSi thin layers epitaxially grown on Si(111)

    NASA Astrophysics Data System (ADS)

    Motta, N.; Sgarlata, A.; De Crescenzi, M.; Derrien, J.

    1996-08-01

    Ge/Si alloys were prepared in UHV by solid phase epitaxy on Si(111) substrates. The alloy formation, as a function of the evaporation rate and the Ge layer thickness has been followed in situ by RHEED and scanning tunneling microscopy. The 5 × 5 surface reconstruction appeared after annealing at 450°C Ge layers (up to 10 Å thick), obtained from a low rate Knudsen cell evaporator. In this case a nearly flat and uniform layer of reconstructed alloy was observed. When using an e-gun high rate evaporator we needed to anneal the Ge layer up to 780°C to obtain a 5 × 5 reconstruction. The grown layer was not flat, with many steps and Ge clusters; at high coverages (10 Å and more) large Ge islands appeared. Moreover, we then succeeded in visualizing at atomic resolution the top of some of these Ge islands which displayed a 2 × 1 reconstruction, probably induced from the high compressive strain due to the lattice mismatch with the substrate. We suggest that this unusual behavior could be connected to the high evaporation rate, which helped the direct formation of Ge microcrystals on the Si substrate during the deposition process.

  3. Thermal stability of MBE-grown epitaxial MoSe2 and WSe2 thin films

    NASA Astrophysics Data System (ADS)

    Chang, Young Jun; Choy, Byoung Ki; Phark, Soo-Hyon; Kim, Minu

    Layered transition metal dichalcogenides (TMDs) draw much attention, because of its unique optical properties and band structures depending on the layer thicknesses. However, MBE growth of epitaxial films demands information about thermal stability of stoichiometry and related electronic structure for high temperature range. We grow epitaxial MoSe2 and WSe2 ultrathin films by using molecular beam epitaxy (MBE). We characterize stoichiometry of films grown at various growth temperature by using various methods, XPS, EDX, and TOF-MEIS. We further test high temperature stability of electronic structure for those films by utilizing in-situ ellipsometry attached to UHV chamber. We discuss threshold temperatures up to 700~1000oC, at which electronic phases changes from semiconductor to metal due to selenium deficiency. This information can be useful for potential application of TMDs for fabrication of Van der Waals multilayers and related devices. This research was supported by Nano.Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning. (2009-0082580), NRF-2014R1A1A1002868.

  4. Influence of Postdeposition Cooling Atmosphere on Thermoelectric Properties of 2% Al-Doped ZnO Thin Films Grown by Pulsed Laser Deposition

    NASA Astrophysics Data System (ADS)

    Saini, S.; Mele, P.; Honda, H.; Matsumoto, K.; Miyazaki, K.; Luna, L. Molina; Hopkins, P. E.

    2015-06-01

    We have investigated the thermoelectric properties of 2% Al-doped ZnO (AZO) thin films depending on the postdeposition cooling atmosphere [in oxygen pressure (AZO-O) or vacuum (AZO-V)]. Thin films were grown by pulsed laser deposition on sapphire () substrates at various deposition temperatures ( to ). All films were c-axis oriented. The electrical conductivity of AZO-V thin films was higher than that of AZO-O thin films across the whole temperature range from 300 K to 600 K, due to the optimal carrier concentration () of AZO-V samples. Furthermore, the thermoelectric performance of AZO-V films increased with the deposition temperature; for instance, the highest power factor of and dimensionless figure of merit of 0.07 at 600 K were found for AZO-V thin film deposited at.

  5. Study of optoelectronic devices using epitaxial barium titanate thin films grown by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Barrios, Pedro Jose

    Barium titanate in crystalline form presents ferroelectricity and a variety of significant effects. Its large piezoelectric, pyroelectric, electrooptic and photoelastic coefficients as well as its high dielectric constant make BaTiO3 (BTO) an excellent choice for transducers, sensors, and optoelectronic devices. Essential to the development of such devices on a microscale basis are to prepare films of high quality, similar to those of bulk crystals, and also to develop a proper fabrication process for low-loss waveguides that allow two-dimensional confinement of light. In this thesis we have studied the deposition of epitaxial BaTiO3 films on MgO single crystal substrates using an RF magnetron sputtering technique. The BaTiO3 films were found to have a single crystal structure with an in-plane epitaxial relationship of BTO (100) ∥MgO (100) as confirmed by X-ray diffraction pole figure measurement. BaTiO3 films' electrical, optical, and structural properties were studied and compared to those of the bulk material. Erbium-doped epitaxial BaTiO3 thin films were also developed using RF magnetron sputtering. The Er-doped BaTiO3 films show clear room temperature photoluminescence at 1.54 μm which corresponds to 4I13/2/to[4I]15/2 transitions of Er3+ ions. This new, added, property may be useful for the design of a new generation of guided optic devices presenting optical gain. We have also developed a novel method for forming channel waveguides in BaTiO3 films. The method exploits the photoelastic effect of BTO induced by thin-film stress. We have carried out numerical analyses on the stress distribution by solving the coupled equations that describe the elastomechanical and piezoelectric effects in the ferroelectric material. The refractive index changes were then calculated taking into account both the photoelastic and electrooptic effect of BaTiO3. The simulation result shows a good agreement with the measurement result. The waveguide structure developed in this

  6. Hydroxyapatite thin films grown by pulsed laser deposition and matrix assisted pulsed laser evaporation: Comparative study

    NASA Astrophysics Data System (ADS)

    Popescu-Pelin, G.; Sima, F.; Sima, L. E.; Mihailescu, C. N.; Luculescu, C.; Iordache, I.; Socol, M.; Socol, G.; Mihailescu, I. N.

    2017-10-01

    Pulsed Laser Deposition (PLD) and Matrix Assisted Pulsed Laser Evaporation (MAPLE) techniques were applied for growing hydroxyapatite (HA) thin films on titanium substrates. All experiments were conducted in a reaction chamber using a KrF* excimer laser source (λ = 248 nm, τFWHM ≈ 25 ns). Half of the samples were post-deposition thermally treated at 500 °C in a flux of water vapours in order to restore crystallinity and improve adherence. Coating surface morphologies and topographies specific to the deposition method were evidenced by scanning electron, atomic force microscopy investigations and profilometry. They were shown to depend on deposition technique and also on the post-deposition treatment. Crystalline structure of the coatings evaluated by X-ray diffraction was improved after thermal treatment. Biocompatibility of coatings, cellular adhesion, proliferation and differentiation tests were conducted using human mesenchymal stem cells (MSCs). Results showed that annealed MAPLE deposited HA coatings were supporting MSCs proliferation, while annealed PLD obtained films were stimulating osteogenic differentiation.

  7. Resistive switching characteristics and mechanism of thermally grown WOx thin films

    NASA Astrophysics Data System (ADS)

    Biju, Kuyyadi P.; Liu, Xinjun; Siddik, Manzar; Kim, Seonghyun; Shin, Jungho; Kim, Insung; Ignatiev, Alex; Hwang, Hyunsang

    2011-09-01

    Resistive switching characteristics of thermally oxidized tungsten thin films and their switching mechanism were investigated, modifying thickness of the active layer (WOx) by varying oxidation conditions. Two types of switching were observed in Pt/WOx/W memory devices. Thinner film (t ≤ 15 nm) exhibits clockwise switching (CWS) with filamentary characteristics, whereas thicker film (t ≥ 25 nm) exhibits counter-clockwise switching (CCWS) with more homogeneous conduction. Both switching modes are highly reliable and show good cycling endurance. The conduction phenomena in two different switching modes were examined. In the case of CWS, the conduction mechanism changes from Schottky emission to ohmic conduction due to the local bypass of Schottky barrier formed at Pt/WOx interface by oxygen vacancies. Contrary to CWS, CCWS showed a completely different conduction mechanism. The high resistance state is dominated by the Schottky emission at low electric field and by Poole-Frenkel emission at high electric field, whereas the low resistance state exhibits the Schottky emission. Different types of switching behavior might be attributed to the non-homogenous defect distribution across the active layer. A possible conduction sketch for two types switching behaviors is also discussed.

  8. Design of step composition gradient thin film transistor channel layers grown by atomic layer deposition

    SciTech Connect

    Ahn, Cheol Hyoun; Hee Kim, So; Gu Yun, Myeong; Koun Cho, Hyung

    2014-12-01

    In this study, we proposed the artificially designed channel structure in oxide thin-film transistors (TFTs) called a “step-composition gradient channel.” We demonstrated Al step-composition gradient Al-Zn-O (AZO) channel structures consisting of three AZO layers with different Al contents. The effects of stacking sequence in the step-composition gradient channel on performance and electrical stability of bottom-gate TFT devices were investigated with two channels of inverse stacking order (ascending/descending step-composition). The TFT with ascending step-composition channel structure (5 → 10 → 14 at. % Al composition) showed relatively negative threshold voltage (−3.7 V) and good instability characteristics with a reduced threshold voltage shift (Δ 1.4 V), which was related to the alignment of the conduction band off-set within the channel layer depending on the Al contents. Finally, the reduced Al composition in the initial layer of ascending step-composition channel resulted in the best field effect mobility of 4.5 cm{sup 2}/V s. We presented a unique active layer of the “step-composition gradient channel” in the oxide TFTs and explained the mechanism of adequate channel design.

  9. Single orientation graphene synthesized on iridium thin films grown by molecular beam epitaxy

    SciTech Connect

    Dangwal Pandey, A. Grånäs, E.; Shayduk, R.; Noei, H.; Vonk, V.; Krausert, K.; Franz, D.; Müller, P.; Keller, T. F.; Stierle, A.

    2016-08-21

    Heteroepitaxial iridium thin films were deposited on (0001) sapphire substrates by means of molecular beam epitaxy, and subsequently, one monolayer of graphene was synthesized by chemical vapor deposition. The influence of the growth parameters on the quality of the Ir films, as well as of graphene, was investigated systematically by means of low energy electron diffraction, x-ray reflectivity, x-ray diffraction, Auger electron spectroscopy, scanning electron microscopy, and atomic force microscopy. Our study reveals (111) oriented iridium films with high crystalline quality and extremely low surface roughness, on which the formation of large-area epitaxial graphene is achieved. The presence of defects, like dislocations, twins, and 30° rotated domains in the iridium films is also discussed. The coverage of graphene was found to be influenced by the presence of 30° rotated domains in the Ir films. Low iridium deposition rates suppress these rotated domains and an almost complete coverage of graphene was obtained. This synthesis route yields inexpensive, air-stable, and large-area graphene with a well-defined orientation, making it accessible to a wider community of researchers for numerous experiments or applications, including those which use destructive analysis techniques or irreversible processes. Moreover, this approach can be used to tune the structural quality of graphene, allowing a systematic study of the influence of defects in various processes like intercalation below graphene.

  10. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-01

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of CC, CH, SiC, and SiH bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio ID/IG. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  11. Thermally driven stability of octadecylphosphonic acid thin films grown on SS316L.

    PubMed

    Lim, Min Soo; Smiley, Katelyn J; Gawalt, Ellen S

    2010-01-01

    Stainless steel 316L is widely used as a biomedical implant material; however, there is concern about the corrosion of metallic implants in the physiological environment. The corrosion process can cause mechanical failure due to resulting cracks and cavities in the implant. Alkyl phosphonic acid forms a thin film by self-assembly on the stainless steel surface and this report conclusively shows that thermal treatment of the octadecylphosphonic acid (ODPA) film greatly enhances the stability of the ODPA molecules on the substrate surface. AFM images taken from the modified substrates revealed that thermally treated films remain intact after methanol, THF, and water flushes, whereas untreated films suffer substantial loss. Water contact angles also show that the hydrophobicity of thermally treated films does not diminish after being incubated in a dynamic flow of water for a 3-hour period, whereas the untreated film becomes increasingly hydrophilic due to loss of ODPA. IR spectra taken of both treated and untreated films after water and THF flushes show that the remaining film retains its initial crystallinity. A model is suggested to explain the stability of ODPA film enhanced by thermal treatment. An ODPA molecule is physisorbed to the surface weakly by hydrogen bonding. Heating drives away water molecules leading to the formation of strong monodentate or mixed mono/bi-dentate bonds of ODPA molecule to the surface.

  12. Structural Characteristics of La2O3 Thin Film Grown on LaB6

    NASA Astrophysics Data System (ADS)

    Kafadaryan, Y. A.; Petrosyan, S. I.; Badalyan, G. R.; Lazaryan, V. G.; Shirinyan, G. H.; Aghamalyan, N. R.; Hovsepyan, R. K.; Semerjian, H. S.; Igityan, A. S.; Kuzanyan, A. M.

    Within the framework of hexagonal lanthanum oxide (h-La2O3) formation, lanthanum hexaboride film on sapphire substrate (LaB6/Al2O3) was oxidized at different temperatures (700-1000 °C) under reduced atmospheric pressure (1·10-2,1.5·10-1Torr) during 30 min. The composition evolution of La2O3/LaB6 structure versus annealing temperature has been studied using XRD, FIR reflectivity spectroscopy, SEM and electron probe X-ray microanalysis (EDS). The annealing of the LaB6 film at T=700 °C under air pressure of 1·10-2 Torr generates thin La2O3 layer which exhibits as inferred from XRD the hexagonal phase. The hydratation of La2O3/LaB6/Al2O3 in distilled water for 30 min and postannealing at 900 °C under air pressure of 1.5·10-1 Torr transform h-La2O3 into hexagonal La(OH)3 phase accompanied monoclinic LaO(OH) and lanthanum oxide carbonate hydrate species.

  13. Single orientation graphene synthesized on iridium thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Dangwal Pandey, A.; Krausert, K.; Franz, D.; Grânäs, E.; Shayduk, R.; Müller, P.; Keller, T. F.; Noei, H.; Vonk, V.; Stierle, A.

    2016-08-01

    Heteroepitaxial iridium thin films were deposited on (0001) sapphire substrates by means of molecular beam epitaxy, and subsequently, one monolayer of graphene was synthesized by chemical vapor deposition. The influence of the growth parameters on the quality of the Ir films, as well as of graphene, was investigated systematically by means of low energy electron diffraction, x-ray reflectivity, x-ray diffraction, Auger electron spectroscopy, scanning electron microscopy, and atomic force microscopy. Our study reveals (111) oriented iridium films with high crystalline quality and extremely low surface roughness, on which the formation of large-area epitaxial graphene is achieved. The presence of defects, like dislocations, twins, and 30° rotated domains in the iridium films is also discussed. The coverage of graphene was found to be influenced by the presence of 30° rotated domains in the Ir films. Low iridium deposition rates suppress these rotated domains and an almost complete coverage of graphene was obtained. This synthesis route yields inexpensive, air-stable, and large-area graphene with a well-defined orientation, making it accessible to a wider community of researchers for numerous experiments or applications, including those which use destructive analysis techniques or irreversible processes. Moreover, this approach can be used to tune the structural quality of graphene, allowing a systematic study of the influence of defects in various processes like intercalation below graphene.

  14. Thermally Driven Stability of Octadecylphosphonic Acid Thin Films Grown on SS316L

    PubMed Central

    Lim, Min Soo; Smiley, Katelyn J.; Gawalt, Ellen S.

    2010-01-01

    Stainless steel 316L is widely used as a biomedical implant material; however, there is concern about the corrosion of metallic implants in the physiological environment. The corrosion process can cause mechanical failure due to resulting cracks and cavities in the implant. Alkyl phosphonic acid forms a thin film by self-assembly on the stainless steel surface and this report conclusively shows that thermal treatment of the octadecylphosphonic acid (ODPA) film greatly enhances the stability of the ODPA molecules on the substrate surface. AFM images taken from the modified substrates revealed that thermally treated films remain intact after methanol, THF and water flushes while untreated films suffer substantial loss. Water contact angles also show that the hydrophobicity of thermally treated films does not diminish after being incubated in a dynamic flow of water for a three hour period while the untreated film becomes increasingly hydrophilic due to loss of ODPA. IR spectra taken of both treated and untreated films after water and THF flushes show that the remaining film retains its initial crystallinity. A model is suggested to explain the stability of ODPA film enhanced by thermal treatment. An ODPA molecule is physisorbed to the surface weakly by hydrogen bonding. Heating drives away water molecules leading to the formation of strong monodentate or mixed mono/bi-dentate bonds of ODPA molecule to the surface. PMID:20648546

  15. Design of step composition gradient thin film transistor channel layers grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Ahn, Cheol Hyoun; Hee Kim, So; Gu Yun, Myeong; Koun Cho, Hyung

    2014-12-01

    In this study, we proposed the artificially designed channel structure in oxide thin-film transistors (TFTs) called a "step-composition gradient channel." We demonstrated Al step-composition gradient Al-Zn-O (AZO) channel structures consisting of three AZO layers with different Al contents. The effects of stacking sequence in the step-composition gradient channel on performance and electrical stability of bottom-gate TFT devices were investigated with two channels of inverse stacking order (ascending/descending step-composition). The TFT with ascending step-composition channel structure (5 → 10 → 14 at. % Al composition) showed relatively negative threshold voltage (-3.7 V) and good instability characteristics with a reduced threshold voltage shift ( Δ 1.4 V), which was related to the alignment of the conduction band off-set within the channel layer depending on the Al contents. Finally, the reduced Al composition in the initial layer of ascending step-composition channel resulted in the best field effect mobility of 4.5 cm2/V s. We presented a unique active layer of the "step-composition gradient channel" in the oxide TFTs and explained the mechanism of adequate channel design.

  16. Refractive index and interband transitions in strain modified NaNbO3 thin films grown by MOCVD

    NASA Astrophysics Data System (ADS)

    Anooz, S. Bin; Petrik, P.; Schmidbauer, M.; Remmele, T.; Schwarzkopf, J.

    2015-09-01

    The influence of lattice strain on the refractive index and optical band gap of NaNbO3 thin films, deposited by the liquid-delivery spin metalorganic chemical vapor deposition method, was investigated by spectroscopic ellipsometry. Epitaxial growth of coherently strained NaNbO3 films was confirmed by high-resolution x-ray diffraction and transmission electron microscopy. Incorporated lattice strain in the films was varied by the use of the oxide substrates NdGaO3, SrTiO3 and DyScO3, which exhibit lattice mismatches to NaNbO3 with different sign, magnitude and anisotropy. The Sellmeier dispersion was employed to analyze the ellipsometry data in energy region of 1.49-2.75 eV. The refractive index at 632.8 nm of the pseudomorphically grown NaNbO3 films critically depends on the incorporated elastic lattice strain and results in a continuous decrease from 2.46 to 2.18 by varying the in-plane strain from compressive to tensile. Band gap energies for films grown under compressive and tensile lattice strain were determined by collecting spectroscopic ellipsometry data in a larger energy range between 0.73-6.48 eV and evaluating them by the Tauc-Lorentz dispersion. We observed that for tensily strained NaNbO3 films deposited on DyScO3 and SrTiO3, the band gap energies increased to 3.60+/- 0.01 and 3.64+/- 0.02 eV, respectively. For the compressively strained NaNbO3 film deposited on NdGaO3 the band gap is shifted to still higher energies (3.80+/- 0.01 eV).

  17. Growth, luminescence and magnetic properties of GaN:Er semiconductor thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Dasari, K.; Wu, J.; Huhtinen, H.; Jadwisienczak, W. M.; Palai, R.

    2017-05-01

    We report on the growth, surface, luminescence and magnetic properties of 180 nm thick Er-doped GaN thin films grown by molecular beam epitaxy (MBE) on c-sapphire substrates with no buffer layer and with different Er concentrations. In situ reflection high-energy electron diffraction (RHEED) patterns revealed crystalline and uniform growth of the films. The x-ray diffraction (XRD) pattern showed c-axis-oriented growth. Atomic force microscopy (AFM) analysis showed enhancement of surface morphology and smoothness with increasing Er doping, which could be due to minimization of surface defects because of the gettering effect of the rare earth. Scanning area-dependent surface morphology analysis showed a power law dependence indicating the fractal nature of the surface, which is confirmed by the observation of a non-integer D (fractal dimension) value. X-ray photoluminescence spectroscopy (XPS) revealed the formation of a GaN:Er phase and ruled out the presence of Ga and Er metallic and native oxide phases. The semi-quantitative elemental composition of the films was determined using N 1s, Ga 2p3/2 and Er 4d photoemission lines. The Er concentration was estimated from the x-ray photoelectron spectra and found to be between 3.0 and 9.0 at.% (˜1021 atoms cm-3). Photoluminescence (PL) and cathodoluminescence (CL) studies showed visible emission and concentration quenching of Er3+ ions in agreement with reported results. Excitation of the Er3+ ion might be affected by charge trapping due to Er-doping-induced defect complexes. The magnetic measurements carried out by a superconducting quantum interference device (SQUID) showed a ferromagnetic-paramagnetic phase transition at low temperature, contrary to the reported room temperature ferromagnetism in metalorganic chemical vapor deposition (MOCVD)-grown GaN:Er thick films of 550 nm.

  18. Martensitic transformation in as-grown and annealed near-stoichiometric epitaxial Ni2MnGa thin films

    NASA Astrophysics Data System (ADS)

    Machain, P.; Condó, A. M.; Domenichini, P.; Pozo López, G.; Sirena, M.; Correa, V. F.; Haberkorn, N.

    2015-08-01

    Magnetic shape memory nanostructures have a great potential in the field of the nanoactuators. The relationship between dimensionality, microstructure and magnetism characterizes the materials performance. Here, we study the martensitic transformation in supported and free-standing epitaxial Ni47Mn24Ga29 films grown by sputtering on (0 0 1) MgO using a stoichiometric Ni2MnGa target. The films have a Curie temperature of ~390 K and a martensitic transition temperature of ~120 K. Similar transition temperatures have been observed in films with thicknesses of 1, 3 and 4 μm. Thicker films (with longer deposition time) present a wider martensitic transformation range that can be associated with small gradients in their chemical concentration due to the high vapour pressure of Mn and Ga. The magnetic anisotropy of the films shows a strong change below the martensitic transformation temperature. No features associated with variant reorientation induced by magnetic field have been observed. Annealed films in the presence of a Ni2MnGa bulk reference change their chemical composition to Ni49Mn26Ga25. The change in the chemical composition increases the martensitic transformation temperature, being closer to the stoichiometric compound, and reduces the transformation hysteresis. In addition, sharper transformations are obtained, which indicate that chemical inhomogeneities and defects are removed. Our results indicate that the properties of Ni-Mn-Ga thin films grown by sputtering can be optimized (fixing the chemical concentration and removing crystalline defects) by the annealing process, which is promising for the development of micromagnetic shape memory devices.

  19. Characteristics of LaB{sub 6} thin films grown by pulsed laser deposition

    SciTech Connect

    Craciun, Valentin; Socol, Gabriel; Craciun, Doina; Cristea, Daniel; Lambers, Eric; Trusca, Roxana; Fairchild, Steven; Back, Tyson; Gruen, Greggory

    2016-09-15

    LaB{sub 6} thin films were deposited at a temperature of 500 °C under vacuum or Ar atmosphere by the pulsed laser deposition technique on (100) Si substrates using a KrF laser. Grazing incidence x-ray diffraction investigations found that films were nanocrystalline, with grain size dimensions from 86 to 102 nm and exhibited microstrain values around 1.1%. Simulations of the x-ray reflectivity curves acquired from the deposited films showed that films had a density around 4.55 g/cm{sup 3}, and were very smooth, with a surface roughness root-mean-square of 1.5 nm, which was also confirmed by scanning electron and atomic force microscopy measurements. All films were covered by a ∼2 nm thick contamination layer that formed when samples were exposed to the ambient. Auger electron spectroscopy investigations found very low oxygen impurity levels below 1.5 at. % once the contamination surface layer was removed by Ar ion sputtering. Four point probe measurements showed that films were conductive, with a resistivity value around 200 μΩ cm for those deposited under Ar atmosphere and slightly higher for those deposited under vacuum. Nanoindentation and scratch investigations showed that films were rather hard, H ∼ 16 GPa, E ∼ 165 GPa, and adherent to the substrate. Thermionic emission measurements indicated a work function value of 2.66 eV, very similar to other reported values for LaB{sub 6}.

  20. Influences of gas adsorption and Au nanoparticles on the electrical properties of CVD-grown MoS2 thin films(Conference Presentation)

    NASA Astrophysics Data System (ADS)

    Cho, Yunae; Sohn, Ahrum; Kim, Sujung; Kim, Dong-Wook; Cho, Byungjin; Hahm, Myung Gwan; Kim, Dong-Ho

    2016-10-01

    Recently, extraordinary physical properties of two-dimensional transition metal dichalcogenides (TMDs) have attracted great attention for various device applications, including photodetectors, field effect transistors, and chemical sensors. There have been intensive research efforts to grow high-quality and large area TMD thin films, and chemical vapor deposition (CVD) techniques enable scalable growth of layered MoS2 films. We investigated the roles of Au nanoparticles (NPs) on the transport and photoresponse of the CVD-grown MoS2 thin films. The Au NPs increased conductivity and enabled fast photoresponse of MoS2 thin films. These results showed that decoration of metal NPs were useful means to tailor the physical properties of CVD-grown MoS2 thin films. To clarify the roles of the metal particles, we compared the transport characteristics of MoS2 thin films with and without the Au NPs in different gas ambient conditions (N2, O2, and H2/N2). The ambient-dependence of the MoS2 thin films allowed us to discuss possible scenarios to explain our results based on considerations of band bending near the Au NPs, gas adsorption/desorption and subsequent charge transfer, and charge scattering/trapping by defect states.

  1. Enhancement of thickness uniformity of thin films grown by pulsed laser deposition

    NASA Technical Reports Server (NTRS)

    Fernandez, Felix E.

    1995-01-01

    A peculiarity of the pulsed laser deposition technique of thin-film growth which limits its applicability is the very rapid drop of resulting film thickness as a function of distance from the deposition axis. This is due to the narrow forward peaking of the emission plume characteristic of the laser ablation process. The plume is usually modeled by a cos(sup n) theta function with n greater, and in some cases, much higher, than 1. Based on this behavior, a method is presented to substantially enhance coverage uniformity in substrate zones of the order of the target-substrate distance h, and to within a specified thickness tolerance. Essentially, target irradiation is caused to form an annular emission source instead of the usual spot. By calculating the resulting thickness profiles, an optimum radius s is found for the annular source, corresponding to a given power in the emission characteristic and a given value of h. The radius of this annulus scales with h. Calculated numerical results for optimal s/h ratios corresponding to a wide range of values for n are provided for the case of +/- 1% tolerance in deviation from the thickness at deposition axis. Manners of producing annular illumination of the target by means of conic optics are presented for the case of a laser beam with radially symmetric profile. The region of uniform coverage at the substrate can be further augmented by extension of the method to multiple concentric annular sources. By using a conic optic of novel design, it is shown also how a single-laser beam can be focused onto a target in the required manner. Applicability of the method would be limited in practice by the available laser power. On the other hand, the effective emitting area can be large, which favors extremely high growth rates, and since growth can occur uniformly over the whole substrate for each laser pulse, single-shot depositions with substantial thicknesses are possible. In addition, the simultaneity of growth over the

  2. Structural, morphological, and optoelectrical characterization of Bi2S3 thin films grown by co-evaporation

    NASA Astrophysics Data System (ADS)

    Mesa, F.; Arredondo, C. A.; Vallejo, W.

    2016-03-01

    This work presents the results of synthesis and characterization of polycrystalline n-type Bi2S3 thin films. The films were grown through a chemical reaction from co-evaporation of their precursor elements in a soda-lime glass substrate. The effect of the experimental conditions on the optical, morphological structural properties, the growth rate, and the electrical conductivity (σ) was studied through spectral transmittance, X-ray diffraction (XRD), atomic force microscopy (AFM) and σ versus T measurements, respectively. The results showed that the films grow only in the orthorhombic Bi2S3 bismuthinite phase. It was also found that the Bi2S3 films present an energy band gap (Eg) of about 1.38 eV. In addition to these results, the electrical conductivity of the Bi2S3 films was affected by both the transport of free carriers in extended states of the conduction band and for variable range hopping transport mechanisms, each one predominating in a different temperature range.

  3. Photoconductivity of ultra-thin Ge(GeSn) layers grown in Si by low-temperature molecular beam epitaxy

    SciTech Connect

    Talochkin, A. B.; Chistokhin, I. B.; Mashanov, V. I.

    2016-04-07

    Photoconductivity (PC) spectra of Si/Ge(GeSn)/Si structures with the ultra-thin (1.0–2.3 nm) Ge and GeSn alloy layers grown by the low-temperature (T = 100 °C) molecular beam epitaxy are studied. Photoresponse in the range of 1.2–0.4 eV related to light absorption in the buried Ge(GeSn) layer is observed. It is shown that in case of lateral PC, a simple diffusion model can be used to determine the absorption coefficient of this layer α ∼ 10{sup 5 }cm{sup −1}. This value is 100 times larger than that of a single Ge quantum dot layer and is reached significantly above the band gap of most bulk semiconductors. The observed absorption is caused by optical transitions between electron and hole states localized at the interfaces. The anomalous high value of α can be explained by the unusual state of Ge(GeSn) layer with high concentration of dangling bonds, the optical properties of which have been predicted theoretically by Knief and von Niessen (Phys. Rev. B 59, 12940 (1999)).

  4. Fabrication and properties of Sb-doped ZnO thin films grown by radio frequency (RF) magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Wang, Peng; Chen, Nuofu; Yin, Zhigang; Yang, Fei; Peng, Changtao

    2006-04-01

    Sb-doped and undoped ZnO thin films were deposited on Si (1 0 0) substrates by radio frequency (RF) magnetron sputtering. X-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses revealed that all the films had polycrystalline wurtzite structure and c-axis preferred orientation. Room temperature Hall measurements showed that the as-grown films were n-type and conducting ( ρ˜1-10 Ω cm). Annealing in a nitrogen ambient at 400 °C for 1 h made both samples highly resistive ( ρ>10 3 Ω cm). Increasing the annealing temperature up to 800 °C, the resistivity of the undoped ZnO film decreased gradually, but it increased for the Sb-doped ZnO film. In the end, the Sb-doped ZnO film annealed at 800 °C became semi-insulating with a resistivity of 10 4 Ω cm. In addition, the effects of annealing treatment and Sb-doping on the structural and electrical properties are discussed.

  5. Temperature-dependent Hall effect studies of ZnO thin films grown by metalorganic chemical vapour deposition

    NASA Astrophysics Data System (ADS)

    Roro, K. T.; Kassier, G. H.; Dangbegnon, J. K.; Sivaraya, S.; Westraadt, J. E.; Neethling, J. H.; Leitch, A. W. R.; Botha, J. R.

    2008-05-01

    The electrical properties of zinc oxide (ZnO) thin films of various thicknesses (0.3-4.4 µm) grown by metalorganic chemical vapour deposition on glass substrates have been studied by using temperature-dependent Hall-effect (TDH) measurements in the 18-300 K range. The high quality of the layers has been confirmed with x-ray diffraction, transmission electron microscopy, scanning electron microscopy and photoluminescence techniques. TDH measurements indicate the presence of a degenerate layer which significantly influences the low-temperature data. It is found that the measured mobility generally increases with increasing layer thickness, reaching a value of 120 cm2 V-1 s-1 at room temperature for the 4.4 µm thick sample. The lateral grain size of the layers is also found to increase with thickness indicating a clear correlation between the size of the surface grains and the electrical properties of corresponding films. Theoretical fits to the Hall data suggest that the bulk conduction of the layers is dominated by a weakly compensated donor with activation energy in the 33-41 meV range and concentration of the order of 1017 cm-3, as well as a total acceptor concentration of mid-1015 cm-3. Grain boundary scattering is found to be an important limiting factor of the mobility throughout the temperature range considered.

  6. Structural and magnetic phase transitions in chromium nitride thin films grown by rf nitrogen plasma molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Alam, Khan; Disseler, Steven M.; Ratcliff, William D.; Borchers, Julie A.; Ponce-Pérez, Rodrigo; Cocoletzi, Gregorio H.; Takeuchi, Noboru; Foley, Andrew; Richard, Andrea; Ingram, David C.; Smith, Arthur R.

    2017-09-01

    A magnetostructural phase transition is investigated in single-crystal chromium nitride (CrN) thin films grown by rf plasma molecular beam epitaxy on MgO(001) substrates. While still within the vacuum environment following molecular beam epitaxy growth, in situ low-temperature scanning tunneling microscopy, and in situ variable low-temperature reflection high-energy electron diffraction are applied, revealing an atomically smooth and metallic CrN(001) surface, and an in-plane structural transition from 1 ×1 (primitive CrN unit cell) to √{2 }×√{2 }-R 45∘ with a transition temperature of (278 ±3 ) K, respectively. Ex situ temperature-dependent measurements using neutron diffraction are also performed, looking at the structural peaks and likewise revealing a first-order structural transition along the [111] out-of-plane direction, with transition temperatures of (268 ± 3) K. Turning to the magnetic peaks, neutron diffraction confirms a clear magnetic transition from paramagnetic at room temperature to antiferromagnetic at low temperatures with a sharp, first-order phase transition and a Néel temperature of (270 ±2 ) K or (280 ±2 ) K for two different films. In addition to the experimental measurements of structural and magnetic ordering, we also discuss results from first-principles theoretical calculations which explore various possible magnetostructural models.

  7. Magnetic properties of Sm-Co thin films grown on MgO(100) deposited from a single alloy target

    SciTech Connect

    Verhagen, T. G. A.; Boltje, D. B.; Ruitenbeek, J. M. van; Aarts, J.

    2014-08-07

    We have grown epitaxial Sm-Co thin films by sputter deposition from a single alloy target with a nominal SmCo{sub 5} composition on Cr(100)-buffered MgO(100) single-crystal substrates. By varying the Ar gas pressure, we can change the composition of the film from a SmCo{sub 5}-like to a Sm{sub 2}Co{sub 7}-like phase. The composition, crystal structure, morphology, and magnetic properties of these films have been determined using Rutherford Backscattering, X-ray diffraction, and magnetization measurements. We find that we can grow films with, at room temperature, coercive fields as high as 3.3 T, but with a remanent magnetization which is lower than can be expected from the texturing. This appears to be due to the Sm content of the films, which is higher than expected from the content of the target, even at the lowest possible sputtering pressures. Moreover, we find relatively large variations of film properties using targets of nominally the same composition. At low temperatures, the coercive fields increase, as expected for these hard magnets, but in the magnetization, we observe a strong background signal from the paramagnetic impurities in the MgO substrates.

  8. Thin yttrium iron garnet films grown by pulsed laser deposition: Crystal structure, static, and dynamic magnetic properties

    SciTech Connect

    Sokolov, N. S. Fedorov, V. V.; Korovin, A. M.; Suturin, S. M.; Baranov, D. A.; Gastev, S. V.; Krichevtsov, B. B.; Bursian, V. E.; Lutsev, L. V.; Maksimova, K. Yu.; Grunin, A. I.; Tabuchi, M.

    2016-01-14

    Pulsed laser deposition has been used to grow thin (10–84 nm) epitaxial layers of Yttrium Iron Garnet Y{sub 3}Fe{sub 5}O{sub 12} (YIG) on (111)–oriented Gadolinium Gallium Garnet substrates at different growth conditions. Atomic force microscopy showed flat surface morphology both on micrometer and nanometer scales. X-ray diffraction measurements revealed that the films are coherent with the substrate in the interface plane. The interplane distance in the [111] direction was found to be by 1.2% larger than expected for YIG stoichiometric pseudomorphic film indicating presence of rhombohedral distortion in this direction. Polar Kerr effect and ferromagnetic resonance measurements showed existence of additional magnetic anisotropy, which adds to the demagnetizing field to keep magnetization vector in the film plane. The origin of the magnetic anisotropy is related to the strain in YIG films observed by XRD. Magneto-optical Kerr effect measurements revealed important role of magnetization rotation during magnetization reversal. An unusual fine structure of microwave magnetic resonance spectra has been observed in the film grown at reduced (0.5 mTorr) oxygen pressure. Surface spin wave propagation has been demonstrated in the in-plane magnetized films.

  9. Thickness-dependent transport channels in topological insulator Bi2Se3 thin films grown by magnetron sputtering

    PubMed Central

    Wang, Wen Jie; Gao, Kuang Hong; Li, Zhi Qing

    2016-01-01

    We study the low-temperature transport properties of Bi2Se3 thin films grown by magnetron sputtering. A positive magnetoresistance resulting from the weak antilocalization (WAL) effect is observed at low temperatures. The observed WAL effect is two dimensional in nature. Applying the Hikami-Larkin-Nagaoka theory, we have obtained the dephasing length. It is found that the temperature dependence of the dephasing length cannot be described only by the Nyquist electron-electron dephasing, in conflict with prevailing experimental results. From the WAL effect, we extract the number of the transport channels, which is found to increase with increasing the thickness of the films, reflecting the thickness-dependent coupling between the top and bottom surface states in topological insulator. On the other hand, the electron-electron interaction (EEI) effect is observed in temperature-dependent conductivity. From the EEI effect, we also extract the number of the transport channel, which shows similar thickness dependence with that obtained from the analysis of the WAL effect. The EEI effect, therefore, can be used to analyze the coupling effect between the top and bottom surface states in topological insulator like the WAL effect. PMID:27142578

  10. Strain relaxation mechanisms in compressively strained thin SiGe-on-insulator films grown by selective Si oxidation

    NASA Astrophysics Data System (ADS)

    Gunji, Marika; Marshall, Ann F.; McIntyre, Paul C.

    2011-01-01

    We report on strain relaxation mechanisms in highly compressive-strained (0.67%-2.33% biaxial strain), thin SiGe-on-insulator (SGOI) structures with Ge atomic fraction ranging from 0.18 to 0.81. SGOI layers (8.7-75 nm thickness) were fabricated by selective oxidization of Si from compressively strained SiGe films epitaxially grown on single crystalline Si-on-insulator (SOI) layers. During high temperature oxidation annealing, strain relaxation occurred due to both intrinsic stacking fault (SF) formation and biaxial stress-driven buckling of the SiGe layers through viscous flow of the overlying and underlying SiO2 layers. Transmission electron microscopy (TEM) and x-ray diffraction were performed to confirm the simultaneous occurrence of these two strain relaxation mechanisms. The results indicate that ˜30 % of the observed strain relaxation can be attributed to formation of intrinsic SFs and the remaining strain relaxation to stress-driven buckling of the SiGe layers. In addition, cross-sectional TEM images show that some of the SFs and layer buckling roughness appears to be spatially correlated.

  11. Superexchange and iron valence control by off-stoichiometry in yttrium iron garnet thin films grown by pulsed laser deposition

    SciTech Connect

    Dumont, Y.; Keller, N.; Popova, E.; Schmool, D.S.; Bhattacharya, S.; Stahl, B.; Tessier, M.; Guyot, M.

    2005-05-15

    Controlled off-stoichiometric single phase polycrystalline yttrium iron garnet (YIG) thin films have been grown by pulsed laser deposition, adjusting the oxygen partial pressure P{sub O2} between 5 and 400 mTorr. Atomic stoichiometry by RBS shows an oxygen deficiency for P{sub O2}P{sub stoich}. P{sub stoich}=30 mTorr refers to films showing magnetic and structural properties of the bulk stoichiometric YIG. Curie temperature T{sub c} and saturation magnetization 4{pi}Ms decreased for P{sub O2}P{sub stoich}: Increase of Tc (up to +10%) and of 4{pi}Ms (up to +20%) and lattice parameter compression. Microscopic interpretation is given in terms of superexchange interaction and creation and site selectivity of iron vacancies.

  12. Impact of low temperature annealing on structural, optical, electrical and morphological properties of ZnO thin films grown by RF sputtering for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Purohit, Anuradha; Chander, S.; Sharma, Anshu; Nehra, S. P.; Dhaka, M. S.

    2015-11-01

    This paper presents effect of low temperature annealing on the physical properties of ZnO thin films for photovoltaic applications. The thin films of thickness 50 nm were grown on glass and indium tin oxide (ITO) coated glass substrates employing radio frequency magnetron sputtering technique followed by thermal annealing within low temperature range 150-450 °C. These as-grown and annealed films were subjected to the X-ray diffraction (XRD), UV-Vis spectrophotometer, source meter and scanning electron microscopy (SEM) for structural, optical, electrical and surface morphological analysis respectively. The compositional analysis of the as-grown ZnO film was also carried out using energy dispersive spectroscopy (EDS). The XRD patterns reveal that the films have wurtzite structure of hexagonal phase with preferred orientation (1 0 0) and polycrystalline in nature. The crystallographic and optical parameters are calculated and discussed in detail. The optical band gap was found in the range 3.30-3.52 eV and observed to decrease with annealing temperature except 150 °C. The current-voltage characteristics show that the films exhibit approximately ohmic behavior. The SEM studies show that the films are uniform, homogeneous and free from crystal defects and voids. The experimental results reveal that ZnO thin films may be used as alternative materials for eco-friendly buffer layer to the thin film solar cell applications.

  13. Thickness measurement of semiconductor thin films by energy dispersive X-ray fluorescence benchtop instrumentation: Application to GaN epilayers grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Queralt, I.; Ibañez, J.; Marguí, E.; Pujol, J.

    2010-07-01

    The importance of thin films in modern high technology products, such as semiconductors, requires fast and non-destructive analysis. A methodology to determine the thickness of single layers with benchtop energy dispersive X-ray fluorescence (EDXRF) instrumentation is described and tested following analytical validation criteria. The experimental work was carried out on gallium nitride thin films epitaxially grown on sapphire substrate. The results of samples with layers in the range from 400 to 1000 nm exhibit a good correlation with the layer thickness determined by optical reflectance. Spectral data obtained using thin layered samples indicate the possibility to precisely evaluate layer thickness from 5 nm, with a low relative standard deviation (RSD < 2%) of the results. In view of the limits of optical reflectance for very thin layer determination, EDXRF analysis offers the potential for the thickness determination of such kind of samples.

  14. Nanoscale observation of surface potential and carrier transport in Cu2ZnSn(S,Se)4 thin films grown by sputtering-based two-step process

    PubMed Central

    2014-01-01

    Stacked precursors of Cu-Zn-Sn-S were grown by radio frequency sputtering and annealed in a furnace with Se metals to form thin-film solar cell materials of Cu2ZnSn(S,Se)4 (CZTSSe). The samples have different absorber layer thickness of 1 to 2 μm and show conversion efficiencies up to 8.06%. Conductive atomic force microscopy and Kelvin probe force microscopy were used to explore the local electrical properties of the surface of CZTSSe thin films. The high-efficiency CZTSSe thin film exhibits significantly positive bending of surface potential around the grain boundaries. Dominant current paths along the grain boundaries are also observed. The surface electrical parameters of potential and current lead to potential solar cell applications using CZTSSe thin films, which may be an alternative choice of Cu(In,Ga)Se2. PACS number: 08.37.-d; 61.72.Mm; 71.35.-y PMID:24397924

  15. Study of post annealing effects on structural and optical properties of sol-gel derived ZnO thin films grown on n-Si substrate

    NASA Astrophysics Data System (ADS)

    Bahadur Yadav, Aniruddh; Periasamy, C.; Jit, S.

    2015-02-01

    Zinc oxide (ZnO) thin films were grown on n-type silicon (100) substrates by sol- gel spin coating technique. The prepared thin films were annealed in the presence of Ar at three different temperatures (at 450°C, 550°C and 650°C) to study the impact of annealing temperature on the structural and optical properties of the ZnO thin films. The structural, surface morphology and optical properties of the thin film were investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM) and photoluminescence (PL) measurements respectively. The grown ZnO thin films are polycrystalline in nature with wurtzite hexagonal structure as evident from the XRD and SEM analyses. It further indicates that the crystalline size increases with increasing annealing temperature. The post annealing is also found to influence the optical properties in the terms of band gap energy of the ZnO thin films. The optical energy band gap was found to be decreased from 3.205 to 3.13eV as the annealing temperature is increased from 450°C to 650°C. However, our results concerning the growth of ZnO thin films on Si substrates suggest that there is an intermediate growth temperature allowing for the optimization of the ZnO film growth. The results of the study can be used as a guideline for growing ZnO thin films on n-Si substrates with a homogenous surface morphology, high surface to volume ratio and desired particle size, which are suited for optoelectronic/ gas sensing applications.

  16. The Seebeck Coefficient in Oxygen Enriched La2NiO4

    NASA Astrophysics Data System (ADS)

    Bach, Paul; Leboran, Victor; Rivadulla, Francisco

    2013-03-01

    Oxide-based devices show promise for themoelectric applications due to their chemical stability and straightforward fabrication. The La2NiO4+δ system has been predicted to show an increased thermopower coupled with an increased electrical conductivity around δ = 0 . 05 [Pardo et al. PRB 86, 165114 (2012)] that could lead to a large thermoelectric figure of merit (ZT). We investigate the suitability of lanthanum nickelate as a candidate material for high-ZT devices through a systematic study of oxygenated thin films grown by pulsed laser deposition. We report the electrical conductivity, Seebeck coefficient, and structural morphology of La2NiO4 grown in a range of oxidizing atmospheres and discuss their implications for controlled engineering of thermoelectric properties. We have explored the possibility of gate-tuning these systems in order to fabricate single-oxide based devices. This work was supported by the Ministerio de Ciencia e Innovación (Spain), grant MAT2010-16157, and the European Research Council, grant ERC-2010-StG 259082 2D THERMS.

  17. Rapid-melt-mediated recrystallization of ZnO thin films grown at low temperature by using KrF excimer laser irradiation

    NASA Astrophysics Data System (ADS)

    Oh, Min-Suk; Seo, Inseok

    2015-11-01

    ZnO thin films with thickness of 150 nm were grown on ITO/glass (ITO-coated glass) substrates by using the radio-frequency (RF) sputtering technique at 400 °C in an Ar atmosphere. An excimer laser irradiation (ELI) treatment was performed on the surface of ZnO thin films at different excimer laser energy densities of 150, 200, and 250 mJ/cm2 in a N2 atmosphere. The ELI treatment promoted the lateral recystallization of the surface area of the ZnO, resulting in a significant improvement of the crystallinity of the ZnO thin films without substrate damage. As-grown ZnO and ELI-treated ZnO thin films were characterized by using scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray diffraction (XRD). The analyses showed that the ZnO thin film treated with ELI at an excimer laser energy density of 150 mJ/cm2 exhibited the best structural properties.

  18. NiO(s) (Bunsenite) is not Available to Alyssum species

    USDA-ARS?s Scientific Manuscript database

    AIMS: To determine if the Ni-hyperaccumulator Alyssum corsicum can absorb Ni from the kinetically inert crystalline mineral NiO(s) (bunsenite). METHODS: A. corsicum and A. montanum plants were grown for 30 days in a serpentine Hoagland solution. NiO was provided at 0 or 0.1 g L-1 (1.34 mmol L-1) ...

  19. Ferromagnetism and Ru-Ru distance in SrRuO3 thin film grown on SrTiO3 (111) substrate

    PubMed Central

    2014-01-01

    Epitaxial SrRuO3 thin films were grown on both (100) and (111) SrTiO3 substrates with atomically flat surfaces that are required to grow high-quality films of materials under debate. The following notable differences were observed in the (111)-oriented SrRuO3 films: (1) slightly different growth mode, (2) approximately 10 K higher ferromagnetic transition temperature, and (3) better conducting behavior with higher relative resistivity ratio, than (100)c-oriented SrRuO3 films. Together with the reported results on SrRuO3 thin films grown on (110) SrTiO3 substrate, the different physical properties were discussed newly in terms of the Ru-Ru nearest neighbor distance instead of the famous tolerance factor. PACS 75.70.Ak; 75.60.Ej; 81.15.Fg PMID:24393495

  20. Angle-resolved photoemission spectroscopy of strontium lanthanum copper oxide thin films grown by molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Harter, John Wallace

    Among the multitude of known cuprate material families and associated structures, the archetype is "infinite-layer" ACuO2, where perfectly square and flat CuO2 planes are separated by layers of alkaline earth atoms. The infinite-layer structure is free of magnetic rare earth ions, oxygen chains, orthorhombic distortions, incommensurate superstructures, ordered vacancies, and other complications that abound among the other material families. Furthermore, it is the only cuprate that can be made superconducting by both electron and hole doping, making it a potential platform for decoding the complex many-body interactions responsible for high-temperature superconductivity. Research on the infinite-layer compound has been severely hindered by the inability to synthesize bulk single crystals, but recent progress has led to high-quality superconducting thin film samples. Here we report in situ angle-resolved photoemission spectroscopy measurements of epitaxially-stabilized Sr1-chiLa chiCuO2 thin films grown by molecular-beam epitaxy. At low doping, the material exhibits a dispersive lower Hubbard band typical of other cuprate parent compounds. As carriers are added to the system, a continuous evolution from Mott insulator to superconducting metal is observed as a coherent low-energy band develops on top of a concomitant remnant lower Hubbard band, gradually filling in the Mott gap. For chi = 0.10, our results reveal a strong coupling between electrons and (pi,pi) anti-ferromagnetism, inducing a Fermi surface reconstruction that pushes the nodal states below the Fermi level and realizing nodeless superconductivity. Electron diffraction measurements indicate the presence of a surface reconstruction that is consistent with the polar nature of Sr1-chiLachiCuO2. Most knowledge about the electron-doped side of the cuprate phase diagram has been deduced by generalizing from a single material family, Re2-chi CechiCuO4, where robust antiferromagnetism has been observed past chi

  1. Parasitic phases at the origin of magnetic moment in BiFeO3 thin films grown by low deposition rate RF sputtering

    NASA Astrophysics Data System (ADS)

    Mori, Thiago J. A.; Mouls, Caroline L.; Morgado, Felipe F.; Schio, Pedro; Cezar, Júlio C.

    2017-09-01

    A series of epitaxial BiFeO3 thin films has been grown under high partial pressure in a pure O2 atmosphere, which leads to a low deposition rate. The samples grown under these conditions have presented an evolution of the quality of the epitaxy as the deposition temperature increases, however, spurious β- Bi2O3 and supertetragonal BiFeO3 phases are present in the films grown at higher temperatures. The presence of γ- Fe2O3 is reported in one growing condition, and has been attributed to the origin of hysteretic ferromagnetic behavior. A second kind of magnetism, with higher magnetic moment and anhysteretic behaviour, is attributed to the presence of mixed phases of BiFeO3.

  2. MBE Grown In x Ga1- x N Thin Films with Bright Visible Emission Centered at 550 nm

    NASA Astrophysics Data System (ADS)

    Dasari, K.; Thapa, B.; Wang, J.; Wright, J.; Kaya, S.; Jadwisienczak, W. M.; Palai, R.

    2016-04-01

    The In x Ga1- x N thin films with indium content of x = 14-18 at.% were successfully grown by using molecular beam epitaxy (MBE) at high growth temperatures from 650°C to 800°C. In situ reflection high-energy electron diffraction (RHEED) of the In x Ga1- x N films confirmed the Stranski-Krastanov growth mode. X-ray diffraction (XRD) of the films confirmed their highly crystalline nature having c-axis orientation with a small fraction of secondary InN phase admixture. High-resolution cross-sectional scanning electron microscopy images showed two-dimensional epilayers growth with thickness of about ˜260 nm. The high growth temperature of In x Ga1- x N epilayers is found to be favorable to facilitate more GaN phase than InN phase. All the fundamental electronic states of In, Ga, and N were identified by x-ray photoelectron spectroscopy (XPS) and the indium composition has been calculated from the obtained XPS spectra with CASAXPS software. The composition calculations from XRD, XPS and photoluminescence closely match each other. The biaxial strain has been calculated and found to be increasing with the In content. Growing In x Ga1- x N at high temperatures resulted in the reduction in stress/strain which affects the radiative electron-hole pair recombination. The In x Ga1- x N film with lesser strain showed a brighter and stronger green emission than films with the larger built-in strain. A weak S-shaped near band edge emission profile confirms the relatively homogeneous distribution of indium.

  3. Optical properties and structure of HfO2 thin films grown by high pressure reactive sputtering

    NASA Astrophysics Data System (ADS)

    Martínez, F. L.; Toledano-Luque, M.; Gandía, J. J.; Cárabe, J.; Bohne, W.; Röhrich, J.; Strub, E.; Mártil, I.

    2007-09-01

    Thin films of hafnium oxide (HfO2) have been grown by high pressure reactive sputtering on transparent quartz substrates (UV-grade silica) and silicon wafers. Deposition conditions were adjusted to obtain polycrystalline as well as amorphous films. Optical properties of the films deposited on the silica substrates were investigated by transmittance and reflectance spectroscopy in the ultraviolet, visible and near infrared range. A numerical analysis method that takes into account the different surface roughness of the polycrystalline and amorphous films was applied to calculate the optical constants (refractive index and absorption coefficient). Amorphous films were found to have a higher refractive index and a lower transparency than polycrystalline films. This is attributed to a higher density of the amorphous samples, which was confirmed by atomic density measurements performed by heavy-ion elastic recoil detection analysis. The absorption coefficient gave an excellent fit to the Tauc law (indirect gap), which allowed a band gap value of 5.54 eV to be obtained. The structure of the films (amorphous or polycrystalline) was found to have no significant influence on the nature of the band gap. The Tauc plots also give information about the structure of the films, because the slope of the plot (the Tauc parameter) is related to the degree of order in the bond network. The amorphous samples had a larger value of the Tauc parameter, i.e. more order than the polycrystalline samples. This is indicative of a uniform bond network with percolation of the bond chains, in contrast to the randomly oriented polycrystalline grains separated by grain boundaries.

  4. Synthesis and frequency-dependent dielectric properties of epitaxial La1.875Sr0.125NiO4 thin films

    SciTech Connect

    Podpirka, Adrian; Tselev, Alexander; Ramanathan, Shriram

    2012-01-01

    Epitaxial thin films of La{sub 1.875}Sr{sub 0.125}NiO{sub 4} (lanthanum strontium nickelate, LSNO) have been synthesized by sputtering onto single crystal oxide substrates and their structural and dielectric properties are reported. High dielectric constants on the order of 10{sup 7} have been measured up to 1 MHz in interdigitated capacitors with a frequency dependence that correlates with substrate imposed strain and texture. The observation of a high dielectric constant albeit with moderate loss tangent at high frequencies motivates further explorations of charge ordering phenomena in such complex oxides and serves to examine size effects on dielectric response by comparison with studies on bulk single crystal LSNO.

  5. MOF-on-MOF heteroepitaxy: perfectly oriented [Zn2(ndc)2(dabco)]n grown on [Cu2(ndc)2(dabco)]n thin films.

    PubMed

    Shekhah, O; Hirai, K; Wang, H; Uehara, H; Kondo, M; Diring, S; Zacher, D; Fischer, R A; Sakata, O; Kitagawa, S; Furukawa, S; Wöll, C

    2011-05-14

    We report the successful heteroepitaxial growth of perfectly oriented hybrid MOF thin films. By employing step-by-step liquid-phase epitaxy (LPE), [Zn(2)(ndc)(2)(dabco)](n) was grown on [Cu(2)(ndc)(2)(dabco)](n), thus demonstrating that the MOF-on-MOF deposition scheme developed for powdered microcrystalline MOF materials can also be applied in connection with LPE for MOF thin films or multilayers. The deposition was monitored by surface plasmon resonance (SPR) spectroscopy, the resulting MOF heterostructures were characterized using IR spectroscopy and different types of X-ray diffraction (XRD)-based techniques. The results suggest that the LPE method is a promising way to fabricate and grow MOF heterostructures, and also demonstrates the potential of [Cu(2)(ndc)(2)(dabco)](n) MOF thin films as substrates for the LPE-based growth of different MOFs on top.

  6. Some optical and electron microscope comparative studies of excimer laser-assisted and nonassisted molecular-beam epitaxically grown thin GaAs films on Si

    NASA Technical Reports Server (NTRS)

    Lao, Pudong; Tang, Wade C.; Rajkumar, K. C.; Guha, S.; Madhukar, A.; Liu, J. K.; Grunthaner, F. J.

    1990-01-01

    The quality of GaAs thin films grown via MBE under pulsed excimer laser irradiation on Si substrates is examined in both laser-irradiated and nonirradiated areas using Raman scattering, Rayleigh scattering, and by photoluminescence (PL), as a function of temperature, and by TEM. The temperature dependence of the PL and Raman peak positions indicates the presence of compressive stress in the thin GaAs films in both laser-irradiated and nonirradiated areas. This indicates incomplete homogeneous strain relaxation by dislocations at the growth temperature. The residual compressive strain at the growth temperature is large enough such that even with the introduction of tensile strain arising from the difference in thermal expansion coefficients of GaAs and Si, a compressive strain is still present at room temperature for these thin GaAs/Si films.

  7. Thickness dependence of magnetic anisotropy and domains in amorphous Co40Fe40B20 thin films grown on PET flexible substrates

    NASA Astrophysics Data System (ADS)

    Tang, Zhenhua; Ni, Hao; Lu, Biao; Zheng, Ming; Huang, Yong-An; Lu, Sheng-Guo; Tang, Minghua; Gao, Ju

    2017-03-01

    The amorphous Co40Fe40B20 (CoFeB) films (5-200 nm in thickness) were grown on flexible polyethylene terephthalate (PET) substrates using the DC magnetron-sputtering method. The thickness dependence of structural and magnetic properties of flexible CoFeB thin films was investigated in detail. The in-plane uniaxial magnetic anisotropy induced by strain as a function of thickness was obtained in flexible CoFeB thin films, and a critical thickness of 150 nm for in-plane magnetic anisotropy was observed. Moreover, the domains and the uniaxial anisotropy as a function of angular direction of applied magnetic field were characterized. The results show potential for designing CoFeB-based flexible spintronic devices in which the physical parameters could be tailored by controlling the thickness of the thin film.

  8. X-ray analysis of strain distribution in two-step grown epitaxial SrTiO{sub 3} thin films

    SciTech Connect

    Panomsuwan, Gasidit E-mail: g.panomsuwan@gmail.com; Takai, Osamu; Saito, Nagahiro

    2014-08-04

    Epitaxial SrTiO{sub 3} (STO) thin films were grown on (001)-oriented LaAlO{sub 3} (LAO) substrates using a two-step growth method by ion beam sputter deposition. An STO buffer layer was initially grown on the LAO substrate at a low temperature of 150 °C prior to growing the STO main layer at 750 °C. The thickness of the STO buffer layer was varied at 3, 6, and 10 nm, while the total film thickness was kept constant at approximately 110 nm. According to x-ray structural analysis, we show that the STO buffer layer plays an essential role in controlling the strain in the STO layer grown subsequently. It is found that the strains in the STO films are more relaxed with an increase in buffer layer thickness. Moreover, the strain distribution in two-step grown STO films becomes more homogeneous across the film thickness when compared to that in directly grown STO film.

  9. Flexible resistive random access memory devices by using NiO x /GaN microdisk arrays fabricated on graphene films

    NASA Astrophysics Data System (ADS)

    Lee, Keundong; Park, Jong-woo; Tchoe, Youngbin; Yoon, Jiyoung; Chung, Kunook; Yoon, Hosang; Lee, Sangik; Yoon, Chansoo; Park, Bae Ho; Yi, Gyu-Chul

    2017-05-01

    We report flexible resistive random access memory (ReRAM) arrays fabricated by using NiO x /GaN microdisk arrays on graphene films. The ReRAM device was created from discrete GaN microdisk arrays grown on graphene films produced by chemical vapor deposition, followed by deposition of NiO x thin layers and Au metal contacts. The microdisk ReRAM arrays were transferred to flexible plastic substrates by a simple lift-off technique. The electrical and memory characteristics of the ReRAM devices were investigated under bending conditions. Resistive switching characteristics, including cumulative probability, endurance, and retention, were measured. After 1000 bending repetitions, no significant change in the device characteristics was observed. The flexible ReRAM devices, constructed by using only inorganic materials, operated reliably at temperatures as high as 180 °C.

  10. Microstructural and magneto-transport characterization of Bi2SexTe3-x topological insulator thin films grown by pulsed laser deposition method

    NASA Astrophysics Data System (ADS)

    Jin, Zhenghe; Kumar, Raj; Hunte, Frank; Narayan, Jay; Kim, Ki Wook; North Carolina State University Team

    Bi2SexTe3-x topological insulator thin films were grown on Al2O3 (0001) substrate by pulsed laser deposition (PLD). XRD and other structural characterization measurements confirm the growth of the textured Bi2SexTe3-x thin films on Al2O3 substrate. The magneto-transport properties of thick and thin Þlms were investigated to study the effect of thickness on the topological insulator properties of the Bi2SexTe3 - x films. A pronounced semiconducting behavior with a highly insulating ground state was observed in the resistivity vs. temperature data. The presence of the weak anti-localization (WAL) effect with a sharp cusp in the magnetoresistance measurements confirms the 2-D surface transport originating from the TSS in Bi2SexTe3-x TI films. A high fraction of surface transport is observed in the Bi2SexTe3-x TI thin films which decreases in Bi2SexTe3-x TI thick films. The Cosine (θ) dependence of the WAL effect supports the observation of a high proportion of 2-D surface state contribution to overall transport properties of the Bi2SexTe3-x TI thin films. Our results show promise that high quality Bi2SexTe3-x TI thin films with significant surface transport can be grown by PLD method to exploit the exotic properties of the surface transport in future generation spintronic devices. This work was supported, in part, by National Science Foundation ECCS-1306400 and FAME.

  11. Fabricating superconducting interfaces between artificially grown LaAlO{sub 3} and SrTiO{sub 3} thin films

    SciTech Connect

    Li, Danfeng Gariglio, Stefano; Cancellieri, Claudia; Fête, Alexandre; Stornaiuolo, Daniela; Triscone, Jean-Marc

    2014-01-01

    Realization of a fully metallic two-dimensional electron gas (2DEG) at the interface between artificially grown LaAlO{sub 3} and SrTiO{sub 3} thin films has been an exciting challenge. Here we present for the first time the successful realization of a superconducting 2DEG at interfaces between artificially grown LaAlO{sub 3} and SrTiO{sub 3} thin films. Our results highlight the importance of two factors—the growth temperature and the SrTiO{sub 3} termination. We use local friction force microscopy and transport measurements to determine that in normal growth conditions the absence of a robust metallic state at low temperature in the artificially grown LaAlO{sub 3}/SrTiO{sub 3} interface is due to the nanoscale SrO segregation occurring on the SrTiO{sub 3} film surface during the growth and the associated defects in the SrTiO{sub 3} film. By adopting an extremely high SrTiO{sub 3} growth temperature, we demonstrate a way to realize metallic, down to the lowest temperature, and superconducting 2DEG at interfaces between LaAlO{sub 3} layers and artificially grown SrTiO{sub 3} thin films. This study paves the way to the realization of functional LaAlO{sub 3}/SrTiO{sub 3} superlattices and/or artificial LaAlO{sub 3}/SrTiO{sub 3} interfaces on other substrates.

  12. Surface oxygen exchange properties of Sr doped La2NiO4+δ as SOFC cathode: Thin-film electrical conductivity relaxation investigation

    DOE PAGES

    Guan, Bo; Li, Wenyuan; Zhang, Xinxin; ...

    2015-06-02

    La2-xSrxNiO4+δ dense films are prepared by a novel spray-modified pressing method. The surface reaction kinetics is investigated via electrical conductivity relaxation (ECR). The layer thickness, 5~10 μm, is much less than the characteristic length of lanthanum nickelates, resulting in surface-controlled situation and allowing more accurate fitting than the traditional pellets ECR on the surface exchange coefficient (k). k for LNO is 1.6×10-5 cm/s in 0.2 atm at 700°C. Sr doping impairs the exchange kinetics, and k of Sr40 is about one order of magnitude smaller than undoped one. Interstitial oxygen and Ni oxidation state are suggested the predominant roles inmore » determining surface kinetics. In conclusion, given the properties of the thin-film herein developed by spray-modified pressing is closer to those in practical porous electrode compared to pulsed laser deposited film in terms of preferential orientation and strain, it warrants the use of such a method in a variety of pertinent investigations.« less

  13. Suppressed weak antilocalization in the topological insulator Bi2Se3 proximity coupled to antiferromagnetic NiO.

    PubMed

    Bhowmick, Tushar; Jerng, Sahng-Kyoon; Jeon, Jae Ho; Roy, Sanjib Baran; Kim, Yong Hyeon; Seo, Junho; Kim, Jun Sung; Chun, Seung-Hyun

    2017-01-05

    Time-reversal symmetry (TRS) breaking of the topological insulators (TIs) is a prerequisite to observe the quantum anomalous Hall effect (QAHE) and topological magnetoelectric effect (TME). Although antiferromagnetism as well as ferromagnetism could break the TRS and generate massive Dirac surface states in the TIs, no attention has been paid to the antiferromagnet-TI heterostructures. Herein, we report the magnetotransport measurements of Bi2Se3 proximately coupled to antiferromagnetic NiO. Thin films of Bi2Se3 were successfully grown on the NiO (001) single crystalline substrates by molecular beam epitaxy. Unexpectedly, we observed a strong suppression of the weak antilocalization effect, which is similar to the case of TIs coupled to the ferromagnetic materials. For the 5 nm-thick Bi2Se3 sample on NiO, we even observed a crossover to weak localization at 2 K. These behaviors are attributed to the strong magnetic exchange field from the Ni 3d electrons. Our results show the effectiveness of the antiferromagnetic materials in breaking the TRS of TIs by the proximity effect and their possible applications for QAHE and TME observations.

  14. Cation Off-Stoichiometry Leads to High p-Type Conductivity and Enhanced Transparency in Co2ZnO4 and Co2NiO4 Thin Films

    SciTech Connect

    Zakutayev, A.; Paudel, T. R.; Ndione, P. F.; Perkins, J. D.; Lany, S.; Zunger, A.; Ginley, D. S.

    2012-02-15

    We explore the effects of cation off-stoichiometry on structural, electrical, optical, and electronic properties of Co{sub 2}ZnO{sub 4} normal spinel and Co{sub 2}NiO{sub 4} inverse spinel using theoretic and experimental (combinatorial and conventional) techniques, both at thermodynamic equilibrium and in the metastable regime. Theory predicts that nonequilibrium substitution of divalent Zn on nominally trivalent octahedral sites increases net hole density in Co{sub 2}ZnO{sub 4}. Experiment confirms high conductivity and high work function in Co{sub 2}NiO{sub 4} and Zn-rich Co{sub 2}ZnO{sub 4} thin films grown by nonequilibrium physical vapor deposition techniques. High p-type conductivities of Co{sub 2}ZnO{sub 4} (up to 5 S/cm) and Co{sub 2}NiO{sub 4} (up to 204 S/cm) are found over a broad compositional range, they are only weakly sensitive to oxygen partial pressure and quite tolerant to a wide range of processing temperatures. In addition, off-stoichiometry caused by nonequilibrium growth decreases the optical absorption of Co{sub 2}ZnO{sub 4} and Co{sub 2}NiO{sub 4} thin films, although the 500-nm thin films still have rather limited transparency. All these properties as well as high work functions make Co{sub 2}ZnO{sub 4} and Co{sub 2}NiO{sub 4} thin films attractive for technological applications, such as hole transport layers in organic photovoltaic devices or p-type buffer layers in inorganic solar cells.

  15. Three-dimensional dispersion of spin waves measured in NiO by resonant inelastic x-ray scattering

    NASA Astrophysics Data System (ADS)

    Betto, D.; Peng, Y. Y.; Porter, S. B.; Berti, G.; Calloni, A.; Ghiringhelli, G.; Brookes, N. B.

    2017-07-01

    We used resonant inelastic x-ray scattering (RIXS) at the Ni L3 edge to measure the dispersion of spin waves in NiO thin films along the [101], [001], and [111] directions. Samples with tensile and compressive in-plane strain show identical dispersion within the experimental uncertainty. The fitting of the data with a linear spin wave model applied to a three-dimensional Heisenberg antiferromagnetic lattice provides a leading superexchange parameter J'=18 meV . The magnon energy at the Brillouin zone boundary and the value of J' are 5 % smaller than those determined by inelastic neutron scattering on bulk single crystals. This discrepancy is likely induced by the strain or other structural differences between bulk and epitaxially grown samples. These results demonstrate the capabilities of high-resolution RIXS in the study of the magnetic structure of thin films and heterostructures for which neutron scattering is not sensitive enough.

  16. p-type conduction from Sb-doped ZnO thin films grown by dual ion beam sputtering in the absence of oxygen ambient

    NASA Astrophysics Data System (ADS)

    Kumar Pandey, Sushil; Kumar Pandey, Saurabh; Awasthi, Vishnu; Kumar, Ashish; Deshpande, Uday P.; Gupta, Mukul; Mukherjee, Shaibal

    2013-10-01

    Sb-doped ZnO (SZO) thin films were deposited on c-plane sapphire substrates by dual ion beam sputtering deposition system in the absence of oxygen ambient. The electrical, structural, morphological, and elemental properties of SZO thin films were studied for films grown at different substrate temperatures ranging from 200 °C to 600 °C and then annealed in situ at 800 °C under vacuum (pressure ˜5 × 10-8 mbar). Films grown for temperature range of 200-500 °C showed p-type conduction with hole concentration of 1.374 × 1016 to 5.538 × 1016 cm-3, resistivity of 66.733-12.758 Ω cm, and carrier mobility of 4.964-8.846 cm2 V-1 s-1 at room temperature. However, the film grown at 600 °C showed n-type behavior. Additionally, current-voltage (I-V) characteristic of p-ZnO/n-Si heterojunction showed a diode-like behavior, and that further confirmed the p-type conduction in ZnO by Sb doping. X-ray diffraction measurements showed that all SZO films had (002) preferred crystal orientation. X-ray photoelectron spectroscopy analysis confirmed the formation of SbZn-2VZn complex caused acceptor-like behavior in SZO films.

  17. An x-ray photoelectron spectroscopy investigation of O impurity chemistry in CdS thin films grown by chemical bath deposition

    SciTech Connect

    Niles, D.W.; Herdt, G.; Al-Jassim, M.

    1997-02-01

    We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH){sub 2} reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H{sub 2}O incorporated into the film during the CBD growth. Ar{sup +} ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS{sub 1{minus}x}O{sub x} ({ital x}{approximately}0.04) in the surface region from the incorporated O impurity. {copyright} {ital 1997 American Institute of Physics.}

  18. O impurity chemistry in CdS thin-films grown by chemical bath deposition: An investigation with x-ray photoelectron spectroscopy

    SciTech Connect

    Niles, D.W.; Herdt, G.; Al-Jassim, M.

    1997-02-01

    We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin-films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin-film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH){sub 2} reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H{sub 2}O incorporated into the film during the CBD growth. Ar{sup +} ion sputtering{emdash}a technique frequently used in thin-film analyses{emdash}preferentially removed S from the CBD CdS thin-film and created CdS{sub 1{minus}x}O{sub x} (x{approximately}0.04) in the surface region from the incorporated O impurity. {copyright} {ital 1997 American Institute of Physics.}

  19. Structural and interfacial characteristics of thin (<10 nm) SiO{sub 2} films grown by electron cyclotron resonance plasma oxidation on [100] Si substrates

    SciTech Connect

    Nguyen, T.D.; Carl, D.A.; Hess, D.W.; Lieberman, M.A.; Gronsky, R.

    1991-04-01

    The feasibility of fabricating ultra-thin SiO{sub 2} films on the order of a few nanometer thickness has been demonstrated. SiO{sub 2} thin films of approximately 7 nm thickness have been produced by ion flux-controlled Electron Cyclotron Resonance plasma oxidation at low temperature on [100] Si substrates, in reproducible fashion. Electrical measurements of these films indicate that they have characteristics comparable to those of thermally grown oxides. The thickness of the films was determined by ellipsometry, and further confirmed by cross-sectional High-Resolution Transmission Electron Microscopy. Comparison between the ECR and the thermal oxide films shows that the ECR films are uniform and continuous over at least a few microns in lateral direction, similar to the thermal oxide films grown at comparable thickness. In addition, HRTEM images reveal a thin (1--1.5 nm) crystalline interfacial layer between the ECR film and the [100] substrate. Thinner oxide films of approximately 5 nm thickness have also been attempted, but so far have resulted in nonuniform coverage. Reproducibility at this thickness is difficult to achieve.

  20. Structural and interfacial characteristics of thin (<10 nm) SiO sub 2 films grown by electron cyclotron resonance plasma oxidation on (100) Si substrates

    SciTech Connect

    Nguyen, T.D.; Carl, D.A.; Hess, D.W.; Lieberman, M.A.; Gronsky, R.

    1991-04-01

    The feasibility of fabricating ultra-thin SiO{sub 2} films on the order of a few nanometer thickness has been demonstrated. SiO{sub 2} thin films of approximately 7 nm thickness have been produced by ion flux-controlled Electron Cyclotron Resonance plasma oxidation at low temperature on (100) Si substrates, in reproducible fashion. Electrical measurements of these films indicate that they have characteristics comparable to those of thermally grown oxides. The thickness of the films was determined by ellipsometry, and further confirmed by cross-sectional High-Resolution Transmission Electron Microscopy. Comparison between the ECR and the thermal oxide films shows that the ECR films are uniform and continuous over at least a few microns in lateral direction, similar to the thermal oxide films grown at comparable thickness. In addition, HRTEM images reveal a thin (1--1.5 nm) crystalline interfacial layer between the ECR film and the (100) substrate. Thinner oxide films of approximately 5 nm thickness have also been attempted, but so far have resulted in nonuniform coverage. Reproducibility at this thickness is difficult to achieve.

  1. XPS Depth Profile Analysis of Zn3N2 Thin Films Grown at Different N2/Ar Gas Flow Rates by RF Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Haider, M. Baseer

    2017-01-01

    Zinc nitride thin films were grown on fused silica substrates at 300 °C by radio frequency magnetron sputtering. Films were grown at different N2/Ar flow rate ratios of 0.20, 0.40, 0.60, 0.80, and 1.0. All the samples have grain-like surface morphology with an average surface roughness ranging from 4 to 5 nm and an average grain size ranging from 13 to16 nm. Zn3N2 samples grown at lower N2/Ar ratio are polycrystalline with secondary phases of ZnO present, whereas at higher N2/Ar ratio, no ZnO phases were found. Highly aligned films were achieved at N2/Ar ratio of 0.60. Hall effect measurements reveal that films are n-type semiconductors, and the highest carrier concentration and Hall mobility was achieved for the films grown at N2/Ar ratio of 0.60. X-ray photoelectron study was performed to confirm the formation of Zn-N bonds and to study the presence of different species in the film. Depth profile XPS analyses of the films reveal that there is less nitrogen in the bulk of the film compared to the nitrogen on the surface of the film whereas more oxygen is present in the bulk of the films possibly occupying the nitrogen vacancies.

  2. XPS Depth Profile Analysis of Zn3N2 Thin Films Grown at Different N2/Ar Gas Flow Rates by RF Magnetron Sputtering.

    PubMed

    Haider, M Baseer

    2017-12-01

    Zinc nitride thin films were grown on fused silica substrates at 300 °C by radio frequency magnetron sputtering. Films were grown at different N2/Ar flow rate ratios of 0.20, 0.40, 0.60, 0.80, and 1.0. All the samples have grain-like surface morphology with an average surface roughness ranging from 4 to 5 nm and an average grain size ranging from 13 to16 nm. Zn3N2 samples grown at lower N2/Ar ratio are polycrystalline with secondary phases of ZnO present, whereas at higher N2/Ar ratio, no ZnO phases were found. Highly aligned films were achieved at N2/Ar ratio of 0.60. Hall effect measurements reveal that films are n-type semiconductors, and the highest carrier concentration and Hall mobility was achieved for the films grown at N2/Ar ratio of 0.60. X-ray photoelectron study was performed to confirm the formation of Zn-N bonds and to study the presence of different species in the film. Depth profile XPS analyses of the films reveal that there is less nitrogen in the bulk of the film compared to the nitrogen on the surface of the film whereas more oxygen is present in the bulk of the films possibly occupying the nitrogen vacancies.

  3. High electron mobility thin-film transistors based on Ga{sub 2}O{sub 3} grown by atmospheric ultrasonic spray pyrolysis at low temperatures

    SciTech Connect

    Thomas, Stuart R. E-mail: thomas.anthopoulos@imperial.ac.uk; Lin, Yen-Hung; Faber, Hendrik; Anthopoulos, Thomas D. E-mail: thomas.anthopoulos@imperial.ac.uk; Adamopoulos, George; Sygellou, Labrini; Stratakis, Emmanuel; Pliatsikas, Nikos; Patsalas, Panos A.

    2014-09-01

    We report on thin-film transistors based on Ga{sub 2}O{sub 3} films grown by ultrasonic spray pyrolysis in ambient atmosphere at 400–450 °C. The elemental, electronic, optical, morphological, structural, and electrical properties of the films and devices were investigated using a range of complementary characterisation techniques, whilst the effects of post deposition annealing at higher temperature (700 °C) were also investigated. Both as-grown and post-deposition annealed Ga{sub 2}O{sub 3} films are found to be slightly oxygen deficient, exceptionally smooth and exhibit a wide energy bandgap of ∼4.9 eV. Transistors based on as-deposited Ga{sub 2}O{sub 3} films show n-type conductivity with the maximum electron mobility of ∼2 cm{sup 2}/V s.

  4. Effect of GaN interlayer on polarity control of epitaxial ZnO thin films grown by molecular beam epitaxy

    SciTech Connect

    Wang, X. Q.; Sun, H. P.; Pan, X. Q.

    2010-10-11

    Epitaxial ZnO thin films were grown on nitrided (0001) sapphire substrates with an intervening GaN layer by rf-plasma-assisted molecular beam epitaxy. It was found that polarity of the ZnO epilayer could be controlled by modifying the GaN interlayer. ZnO grown on a distorted 3-nm-thick GaN interlayer has Zn-polarity while ZnO on a 20-nm-thick GaN interlayer with a high structural quality has O-polarity. High resolution transmission electron microscopy analysis indicates that the polarity of ZnO epilayer is controlled by the atomic structure of the interface between the ZnO buffer layer and the intervening GaN layer.

  5. Thermal stability and relaxation mechanisms in compressively strained Ge0.94Sn0.06 thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Fleischmann, C.; Lieten, R. R.; Hermann, P.; Hönicke, P.; Beckhoff, B.; Seidel, F.; Richard, O.; Bender, H.; Shimura, Y.; Zaima, S.; Uchida, N.; Temst, K.; Vandervorst, W.; Vantomme, A.

    2016-08-01

    Strained Ge1-xSnx thin films have recently attracted a lot of attention as promising high mobility or light emitting materials for future micro- and optoelectronic devices. While they can be grown nowadays with high crystal quality, the mechanism by which strain energy is relieved upon thermal treatments remains speculative. To this end, we investigated the evolution (and the interplay) of composition, strain, and morphology of strained Ge0.94Sn0.06 films with temperature. We observed a diffusion-driven formation of Sn-enriched islands (and their self-organization) as well as surface depressions (pits), resulting in phase separation and (local) reduction in strain energy, respectively. Remarkably, these compositional and morphological instabilities were found to be the dominating mechanisms to relieve energy, implying that the relaxation via misfit generation and propagation is not intrinsic to compressively strained Ge0.94Sn0.06 films grown by molecular beam epitaxy.

  6. High-efficiency blue LEDs with thin AlGaN interlayers in InGaN/GaN MQWs grown on Si (111) substrates

    NASA Astrophysics Data System (ADS)

    Kimura, Shigeya; Yoshida, Hisashi; Ito, Toshihide; Okada, Aoi; Uesugi, Kenjiro; Nunoue, Shinya

    2016-02-01

    We demonstrate high-efficiency blue light-emitting diodes (LEDs) with thin AlGaN interlayers in InGaN/GaN multiquantum wells (MQWs) grown on Si (111) substrates. The peak external quantum efficiency (EQE) ηEQE of 82% at room temperature and the hot/cold factor (HCF) of 94% have been obtained by using the functional thin AlGaN interlayers in the MQWs in addition to reducing threading dislocation densities (TDDs) in the blue LEDs. An HCF is defined as ηEQE(85°C)/ηEQE(25°C). The blue LED structures were grown by metal-organic chemical vapor deposition on Si (111) substrates. The MQWs applied as an active layer have 8- pairs of InGaN/AlyGa1-yN/GaN (0<=y<=1) heterostructures. Thinfilm LEDs were fabricated by removing the Si (111) substrates from the grown layers. It is observed by high-resolution transmission electron microscopy and three-dimensional atom probe analysis that the 1 nm-thick AlyGa1-yN interlayers, whose Al content is y=0.3 or less, are continuously formed. EQE and the HCFs of the LEDs with thin Al0.15Ga0.85N interlayers are enhanced compared with those of the samples without the interlayers in the low-current-density region. We consider that the enhancement is due to both the reduction of the nonradiative recombination centers and the increase of the radiative recombination rate mediated by the strain-induced hole carriers indicated by the simulation of the energy band diagram.

  7. Morphological variations of Mn-doped ZnO dilute magnetic semiconductors thin films grown by succesive ionic layer by adsorption reaction method.

    PubMed

    Balamurali, Subramanian; Chandramohan, Rathinam; Karunakaran, Marimuthu; Mahalingam, Thayan; Parameswaran, Padmanaban; Suryamurthy, Nagamani; Sukumar, Arcod Anandhakrishnan

    2013-07-01

    Transparent conducting Mn-doped ZnO thin films have been prepared by successive ionic layer by adsorption reaction (SILAR) method. The deposition conditions have been optimized based on their structure and on the formation of smoothness, adherence, and stoichiometry. The results of the studies by X-ray diffraction, scanning electron microscope (SEM), reveal the varieties of structural and morphological modifications feasible with SILAR method. The X-ray diffraction patterns confirm that the ZnO:Mn has wurtzite structure. The interesting morphological variations with dopant concentration are observed and discussed. The films' quality is comparable with those grown with physical methods and is suitable for spintronic applications.

  8. High hole concentration Li-doped NiZnO thin films grown by photo-assisted metal-organic chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhao, Y. D.; Dong, X.; Ma, Z. Z.; Zhang, Y. T.; Wu, B.; Zhuang, S. W.; Zhang, B. L.; Li, W. C.; Du, G. T.

    2016-11-01

    High hole concentration Li-doped NiZnO thin films were grown by metal-organic chemical vapor deposition (MOCVD). The crystalline, optical, electrical, and morphological characteristics of the NiZnO films were studied as a function of lithium content. The resistance of the films decreased and the hole concentration greatly increased with increasing lithium content. However, the crystalline and optical properties were observed to degrade as the lithium content was increased. To relieve the degradation, a photo-assisted MOCVD method was used in order to restrict this degradation and this represents a new way to obtain stable high hole concentration NiZnO films.

  9. Positive magnetoresistance in ferromagnetic Nd-doped In{sub 2}O{sub 3} thin films grown by pulse laser deposition

    SciTech Connect

    Xing, G. Z. Yi, J. B.; Li, S.; Yan, F.; Wu, T.

    2014-05-19

    We report the magnetic and magnetotransport properties of (In{sub 0.985}Nd{sub 0.015}){sub 2}O{sub 2.89} thin films grown by pulse laser deposition. The clear magnetization hysteresis loops with the complementary magnetic domain structure reveal the intrinsic room temperature ferromagnetism in the as-prepared films. The strong sp-f exchange interaction as a result of the rare earth doping is discussed as the origin of the magnetotransport behaviours. A positive magnetoresistance (∼29.2%) was observed at 5 K and ascribed to the strong ferromagnetic sp-f exchange interaction in (In{sub 0.985}Nd{sub 0.015}){sub 2}O{sub 2.89} thin films due to a large Zeeman splitting in an external magnetic field of 50 KOe.

  10. Detection of Fe2+ valence states in Fe doped SrTiO3 epitaxial thin films grown by pulsed laser deposition.

    PubMed

    Koehl, Annemarie; Kajewski, Dariusz; Kubacki, Jerzy; Lenser, Christian; Dittmann, Regina; Meuffels, Paul; Szot, Kristof; Waser, Rainer; Szade, Jacek

    2013-06-07

    We present an X-ray absorption spectroscopy study on Fe-doped SrTiO3 thin films grown by pulsed laser deposition. The Fe L2,3 edge spectra are recorded for doping concentrations from 0-5% after several annealing steps at moderate temperatures. The Fe valence state is determined by comparison with an ilmenite reference sample and calculations according to the charge transfer multiplet model. We found clear evidence of Fe(2+) and Fe(3+) oxidation states independently of the doping concentration. The Fe(2+) signal is enhanced at the surface and increases after annealing. The Fe(2+) configuration is in contrast to the mixed Fe(3+)/Fe(4+) valence state in bulk material and must be explained by the specific defect structure of the thin films due to the kinetically limited growth which induces a high concentration of oxygen vacancies.

  11. Magnetic properties of low-moment ferrimagnetic Heusler Cr 2 CoGa thin films grown by molecular beam epitaxy

    SciTech Connect

    Jamer, Michelle E.; Sterbinsky, George E.; Stephen, Gregory M.; DeCapua, Matthew C.; Player, Gabriel; Heiman, Don

    2016-10-31

    Recently, theorists have predicted many materials with a low magnetic moment and large spin-polarization for spintronic applications. These compounds are predicted to form in the inverse Heusler structure; however, many of these compounds have been found to phase segregate. In this study, ordered Cr2CoGa thin films were synthesized without phase segregation using molecular beam epitaxy. The present as-grown films exhibit a low magnetic moment from antiferromagnetically coupled Cr and Co atoms as measured with superconducting quantum interface device magnetometry and soft X-ray magnetic circular dichroism. Electrical measurements demonstrated a thermally-activated semiconductor-like resistivity component with an activation energy of 87 meV. These results confirm spin gapless semiconducting behavior, which makes these thin films well positioned for future devices.

  12. Microstructure of Co/X (X=Cu,Ag,Au) epitaxial thin films grown on Al{sub 2}O{sub 3}(0001) substrates

    SciTech Connect

    Ohtake, Mitsuru; Akita, Yuta; Futamoto, Masaaki; Kirino, Fumiyoshi

    2007-05-01

    Epitaxial thin films of Co/X (X=Cu,Ag,Au) were prepared on Al{sub 2}O{sub 3}(0001) substrates at substrate temperatures of 100 and 300 degree sign C by UHV molecular beam epitaxy. A complicated microstructure was realized for the epitaxial thin films. In-situ reflection high-energy electron diffraction observation has shown that X atoms of the buffer layer segregated to the surface during Co layer deposition, and it yielded a unique epitaxial granular structure. The structure consists of small Co grains buried in the X buffer layer, where both the magnetic small Co grains and the nonmagnetic X layer are epitaxially grown on the single crystal substrate. The structure varied depending on the X element and the substrate temperature. The crystal structure of Co grains is influenced by the buffer layer material and determined to be hcp and fcc structures for the buffer layer materials of Au and Cu, respectively.

  13. Thin films of metal oxides grown by chemical vapor deposition from volatile transition metal and lanthanide metal complexes

    NASA Astrophysics Data System (ADS)

    Pollard, Kimberly Dona

    1998-08-01

    This thesis describes the synthesis and characterization of novel volatile metal-organic complexes for the chemical vapor deposition (CVD) of metal oxides. Monomeric tantalum complexes, lbrack Ta(OEt)sb4(beta-diketonate)) are prepared by the acid-base reaction of lbrack Tasb2(OEt)sb{10}rbrack with a beta-diketone, (RC(O)CHsb2C(O)Rsp' for R = CHsb3, Rsp' = CFsb3; R = Rsp'=C(CHsb3)sb3; R = Csb3Fsb7,\\ Rsp'=C(CHsb3)sb3;\\ R=Rsp'=CFsb3; and R = Rsp' = CHsb3). The products are characterized spectroscopically. Thermal CVD using these complexes as precursors gave good quality Tasb2Osb5 thin films which are characterized by XPS, SEM, electrical measurements, and XRD. Factors affecting the film deposition such as the type of carrier gas and the temperature of the substrate were considered. Catalyst-enhanced CVD reactions with each of the precursors and a palladium catalyst, ((2-methylallyl)Pd(acac)), were studied as a lower temperature route to good quality Tasb2Osb5 films. The decomposition mechanism at the hot substrate surface was studied. Precursors for the formation of yttria by CVD were examined. New complexes of the form (Y(hfac)sb3(glyme)), (hfac = \\{CFsb3C(O)CHC(O)CFsb3\\}sp-,\\ glyme=CHsb3O(CHsb2CHsb2O)sb{n}CHsb3 for n = 1-4) were synthesized and characterized spectroscopically. X-ray structural determinations of three new complexes were obtained. CVD reaction conditions were determined which give YOF films and, with catalyst-enhanced CVD, reaction conditions which give selective formation of Ysb2Osb3, YOF, or YFsb3. The films were studied by XPS, SEM, and XRD. Decomposition mechanisms which lead to film formation, together with a possible route for fluorine atom transfer from the ligand to the metal resulting in fluorine incorporation, were studied by analysis of exhaust products using GC-MS. Novel precursors of the form lbrack Ce(hfac)sb3(glyme)rbrack,\\ (hfac=\\{CFsb3C(O)CHC(O)CFsb3\\}sp-,\\ glyme=CHsb3O(CHsb2CHsb2O)sb{n}CHsb3, n = 1-4) for CVD of ceria were

  14. Optical properties of epitaxial BiFeO3 thin film grown on SrRuO3-buffered SrTiO3 substrate

    PubMed Central

    2014-01-01

    The BiFeO3 (BFO) thin film was deposited by pulsed-laser deposition on SrRuO3 (SRO)-buffered (111) SrTiO3 (STO) substrate. X-ray diffraction pattern reveals a well-grown epitaxial BFO thin film. Atomic force microscopy study indicates that the BFO film is rather dense with a smooth surface. The ellipsometric spectra of the STO substrate, the SRO buffer layer, and the BFO thin film were measured, respectively, in the photon energy range 1.55 to 5.40 eV. Following the dielectric functions of STO and SRO, the ones of BFO described by the Lorentz model are received by fitting the spectra data to a five-medium optical model consisting of a semi-infinite STO substrate/SRO layer/BFO film/surface roughness/air ambient structure. The thickness and the optical constants of the BFO film are obtained. Then a direct bandgap is calculated at 2.68 eV, which is believed to be influenced by near-bandgap transitions. Compared to BFO films on other substrates, the dependence of the bandgap for the BFO thin film on in-plane compressive strain from epitaxial structure is received. Moreover, the bandgap and the transition revealed by the Lorentz model also provide a ground for the assessment of the bandgap for BFO single crystals. PMID:24791162

  15. Optical properties of epitaxial BiFeO3 thin film grown on SrRuO3-buffered SrTiO3 substrate.

    PubMed

    Xu, Ji-Ping; Zhang, Rong-Jun; Chen, Zhi-Hui; Wang, Zi-Yi; Zhang, Fan; Yu, Xiang; Jiang, An-Quan; Zheng, Yu-Xiang; Wang, Song-You; Chen, Liang-Yao

    2014-01-01

    The BiFeO3 (BFO) thin film was deposited by pulsed-laser deposition on SrRuO3 (SRO)-buffered (111) SrTiO3 (STO) substrate. X-ray diffraction pattern reveals a well-grown epitaxial BFO thin film. Atomic force microscopy study indicates that the BFO film is rather dense with a smooth surface. The ellipsometric spectra of the STO substrate, the SRO buffer layer, and the BFO thin film were measured, respectively, in the photon energy range 1.55 to 5.40 eV. Following the dielectric functions of STO and SRO, the ones of BFO described by the Lorentz model are received by fitting the spectra data to a five-medium optical model consisting of a semi-infinite STO substrate/SRO layer/BFO film/surface roughness/air ambient structure. The thickness and the optical constants of the BFO film are obtained. Then a direct bandgap is calculated at 2.68 eV, which is believed to be influenced by near-bandgap transitions. Compared to BFO films on other substrates, the dependence of the bandgap for the BFO thin film on in-plane compressive strain from epitaxial structure is received. Moreover, the bandgap and the transition revealed by the Lorentz model also provide a ground for the assessment of the bandgap for BFO single crystals.

  16. High-Performance Flexible Thin-Film Transistors Based on Single-Crystal-like Silicon Epitaxially Grown on Metal Tape by Roll-to-Roll Continuous Deposition Process.

    PubMed

    Gao, Ying; Asadirad, Mojtaba; Yao, Yao; Dutta, Pavel; Galstyan, Eduard; Shervin, Shahab; Lee, Keon-Hwa; Pouladi, Sara; Sun, Sicong; Li, Yongkuan; Rathi, Monika; Ryou, Jae-Hyun; Selvamanickam, Venkat

    2016-11-02

    Single-crystal-like silicon (Si) thin films on bendable and scalable substrates via direct deposition are a promising material platform for high-performance and cost-effective devices of flexible electronics. However, due to the thick and unintentionally highly doped semiconductor layer, the operation of transistors has been hampered. We report the first demonstration of high-performance flexible thin-film transistors (TFTs) using single-crystal-like Si thin films with a field-effect mobility of ∼200 cm(2)/V·s and saturation current, I/lW > 50 μA/μm, which are orders-of-magnitude higher than the device characteristics of conventional flexible TFTs. The Si thin films with a (001) plane grown on a metal tape by a "seed and epitaxy" technique show nearly single-crystalline properties characterized by X-ray diffraction, Raman spectroscopy, reflection high-energy electron diffraction, and transmission electron microscopy. The realization of flexible and high-performance Si TFTs can establish a new pathway for extended applications of flexible electronics such as amplification and digital circuits, more than currently dominant display switches.

  17. Co{sub 2}FeAl Heusler thin films grown on Si and MgO substrates: Annealing temperature effect

    SciTech Connect

    Belmeguenai, M. Tuzcuoglu, H.; Zighem, F.; Chérif, S. M.; Moch, P.; Gabor, M. S. Petrisor, T.; Tiusan, C.

    2014-01-28

    10 nm and 50 nm Co{sub 2}FeAl (CFA) thin films have been deposited on MgO(001) and Si(001) substrates by magnetron sputtering and annealed at different temperatures. X-rays diffraction revealed polycrystalline or epitaxial growth (according to CFA(001)[110]//MgO(001)[100] epitaxial relation) for CFA films grown on a Si and on a MgO substrate, respectively. For these later, the chemical order varies from the A2 phase to the B2 phase when increasing the annealing temperature (T{sub a}), while only the A2 disorder type has been observed for CFA grown on Si. Microstrip ferromagnetic resonance (MS-FMR) measurements revealed that the in-plane anisotropy results from the superposition of a uniaxial and a fourfold symmetry term for CFA grown on MgO substrates. This fourfold anisotropy, which disappears completely for samples grown on Si, is in accord with the crystal structure of the samples. The fourfold anisotropy field decreases when increasing T{sub a}, while the uniaxial anisotropy field is nearly unaffected by T{sub a} within the investigated range. The MS-FMR data also allow for concluding that the gyromagnetic factor remains constant and that the exchange stiffness constant increases with T{sub a}. Finally, the FMR linewidth decreases when increasing T{sub a}, due to the enhancement of the chemical order. We derive a very low intrinsic damping parameter (1.1×10{sup −3} and 1.3×10{sup −3} for films of 50 nm thickness annealed at 615 °C grown on MgO and on Si, respectively)

  18. Evolution of morphology and structure of Pb thin films grown by pulsed laser deposition at different substrate temperatures

    SciTech Connect

    Lorusso, Antonella Maiolo, Berlinda; Perrone, Alessio; Gontad, Francisco; Maruccio, Giuseppe; Tasco, Vittorianna

    2014-03-15

    Pb thin films were prepared by pulsed laser deposition on a Si (100) substrate at different growth temperatures to investigate their morphology and structure. The morphological analysis of the thin metal films showed the formation of spherical submicrometer grains whose average size decreased with temperature. X-ray diffraction measurements confirmed that growth temperature influences the Pb polycrystalline film structure. A preferred orientation of Pb (111) normal to the substrate was achieved at 30 °C and became increasingly pronounced along the Pb (200) plane as the substrate temperature increased. These thin films could be used to synthesize innovative materials, such as metallic photocathodes, with improved photoemission performances.

  19. NIO1 diagnostics

    SciTech Connect

    Zaniol, B. Barbisan, M.; Pasqualotto, R.; Serianni, G.; Cavenago, M.; De Muri, M.; Mimo, A.

    2015-04-08

    The radio frequency ion source NIO1, jointly developed by Consorzio RFX and INFN-LNL, will generate a 60kV-135mA hydrogen negative ion beam, composed of 9 beamlets over an area of about 40 × 40 mm{sup 2}. This experiment will operate in continuous mode and in conditions similar to those foreseen for the larger ion sources of the Neutral Beam Injectors for ITER. The modular design of NIO1 is convenient to address the several still open important issues related to beam extraction, optics, and performance optimization. To this purpose a set of diagnostics is being implemented. Electric and water cooling plant related measurements will allow monitoring current, pressure, flow, and temperature. The plasma in the source will be characterized by emission spectroscopy, cavity ring-down and laser absorption spectroscopy. The accelerated beam will be analyzed with a fast emittance scanner, its intensity profile and divergence with beam emission spectroscopy and visible tomography. The power distribution of the beam on the calorimeter will be monitored by thermocouples and by an infrared camera. This contribution presents the implementation and initial operation of some of these diagnostics in the commissioning phase of the experiment, in particular the cooling water calorimetry and emission spectroscopy.

  20. NIO1 diagnostics

    NASA Astrophysics Data System (ADS)

    Zaniol, B.; Barbisan, M.; Cavenago, M.; De Muri, M.; Mimo, A.; Pasqualotto, R.; Serianni, G.

    2015-04-01

    The radio frequency ion source NIO1, jointly developed by Consorzio RFX and INFN-LNL, will generate a 60kV-135mA hydrogen negative ion beam, composed of 9 beamlets over an area of about 40 × 40 mm2. This experiment will operate in continuous mode and in conditions similar to those foreseen for the larger ion sources of the Neutral Beam Injectors for ITER. The modular design of NIO1 is convenient to address the several still open important issues related to beam extraction, optics, and performance optimization. To this purpose a set of diagnostics is being implemented. Electric and water cooling plant related measurements will allow monitoring current, pressure, flow, and temperature. The plasma in the source will be characterized by emission spectroscopy, cavity ring-down and laser absorption spectroscopy. The accelerated beam will be analyzed with a fast emittance scanner, its intensity profile and divergence with beam emission spectroscopy and visible tomography. The power distribution of the beam on the calorimeter will be monitored by thermocouples and by an infrared camera. This contribution presents the implementation and initial operation of some of these diagnostics in the commissioning phase of the experiment, in particular the cooling water calorimetry and emission spectroscopy.

  1. Characterization of nanostructured VO2 thin films grown by magnetron controlled sputtering deposition and post annealing method.

    PubMed

    Chen, Sihai; Lai, Jianjun; Dai, Jun; Ma, Hong; Wang, Hongchen; Yi, Xinjian

    2009-12-21

    By magnetron controlled sputtering system, a new nanostructured metastable monoclinic phase VO2 (B) thin film has been fabricated. The testing result shows that this nanostructured VO2 (B) thin film has high temperature coefficient of resistance (TCR) of -7%/K. Scanning electron microscopy measurement shows that the average grain diameter of the VO2 (B) crystallite is between 100 and 250 nm. After post annealed, VO2 (B) crystallite is changed into monoclinic (M) phase VO2 (M) crystallite with the average grain diameter between 20 and 50 nm. A set up of testing the thin film switching time is established. The test result shows the switching time is about 50 ms. With the nanostructured VO2 (B) and VO2 (M) thin films, optical switches and high sensitivity detectors will be presented.

  2. Nano-indentation of single-layer optical oxide thin films grown by electron-beam deposition

    SciTech Connect

    Mehrotra, K.; Oliver, J. B.; Lambropoulos, J. C.

    2015-01-01

    Mechanical characterization of optical oxide thin films is performed using nano-indentation, and the results are explained based on the deposition conditions used. These oxide films are generally deposited to have a porous microstructure that optimizes laser induced damage thresholds, but changes in deposition conditions lead to varying degrees of porosity, density, and possibly the microstructure of the thin film. This can directly explain the differences in the mechanical properties of the film studied here and those reported in literature. Of the four single-layer thin films tested, alumina was observed to demonstrate the highest values of nano-indentation hardness and elastic modulus. This is likely a result of the dense microstructure of the thin film arising from the particular deposition conditions used.

  3. Structural, electrical and optical properties of Dy doped ZnO thin films grown by buffer assisted pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Ajimsha, R. S.; Das, A. K.; Singh, B. N.; Misra, P.; Kukreja, L. M.

    2010-04-01

    Transparent conductive dysprosium doped ZnO (Dy:ZnO) thin films with preferential orientation in the (0 0 0 2) direction were deposited on (0 0 0 1) sapphire substrate by buffer assisted pulsed laser deposition. The experimental results show that the resistivity of Dy:ZnO thin films decreased to a minimum value of ∼7.6×10 -4 Ω cm with increasing Dy concentration up to ∼0.45 at%, then increased with the further increase of Dy concentration. On the contrary, the band gap and carrier concentration of Dy:ZnO thin films initially increased, then decreased with increase of Dy concentration. The blue shift of band gap of Dy:ZnO thin films with increasing carrier concentration was attributed to the competing effects of Burstein-Moss shift and band gap narrowing. A bright room temperature photoluminescence observed at ∼575 nm in all the Dy:ZnO thin films, with maximum intensity at ∼0.45 at% of Dy doping, was attributed to be due to intra-band transitions of Dy 3+ in ZnO. Near band edge photoluminescence of ZnO was observed at ∼380 nm with photoluminescence intensity decreasing with increase of Dy concentration. Such Dy:ZnO thin films are found to be suitable candidate for luminescent device applications.

  4. Colossal magnetoresistance effect in epitaxially grown La 2/3Ca 1/3MnO 3 perovskite-like manganite thin films

    NASA Astrophysics Data System (ADS)

    Malisa, A.; Ivanov, Z.

    2005-09-01

    We report in this work, study on colossal magnetoresistance (CMR) effect in epitaxial La 2/3Ca 1/3 MnO 3 thin films grown on SrTiO 3 (0 0 1) substrates by pulsed laser deposition (PLD) technique. The films were grown on as-received SrTiO 3 substrates and on SrTiO 3 substrates prepared by HF etching (Koster et al., Appl. Phys. Lett. 73 (1998) 2920; V. Leca et al., Wet etching methods for perovskite substrates, University of Twente, MESA+ Research Institute, Low Temperature Division). Two of the samples were annealed in different conditions to investigate the films heat treatment effect on electric and magnetic properties. Electrical resistance was done using the four-probe method at temperatures in the range of 2-375 K without a magnetic field and in an external field of 5 T applied in the film plane. Resistance-magnetic field ( R vs. H) at 77 K for the two annealed samples was done in a 5 T sweep magnetic field. The surface morphology and structural information of the films were obtained using atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. Secondary ion mass spectroscopy (SIMS) analysis was performed on the annealed samples to investigate any possible chemical reaction between La 2/3Ca 1/3MnO 3 thin films and SrTiO 3 substrate.

  5. Characterization of high-{kappa} LaLuO{sub 3} thin film grown on AlGaN/GaN heterostructure by molecular beam deposition

    SciTech Connect

    Yang Shu; Huang Sen; Chen Hongwei; Chen, Kevin J.; Schnee, Michael; Zhao Qingtai; Schubert, Juergen

    2011-10-31

    We report the study of high-dielectric-constant (high-{kappa}) dielectric LaLuO{sub 3} (LLO) thin film that is grown on AlGaN/GaN heterostructure by molecular beam deposition (MBD). The physical properties of LLO on AlGaN/GaN heterostrucure have been investigated with atomic force microscopy, x-ray photoelectron spectroscopy, and TEM. It is revealed that the MBD-grown 16 nm-thick LLO film is polycrystalline with a thin ({approx}2 nm) amorphous transition layer at the LLO/GaN interface. The bandgap of LLO is derived as 5.3 {+-} 0.04 eV from O1s energy loss spectrum. Capacitance-voltage (C-V) characteristics of a Ni-Au/LLO/III-nitride metal-insulator-semiconductor diode exhibit small frequency dispersion (<2%) and reveal a high effective dielectric constant of {approx}28 for the LLO film. The LLO layer is shown to be effective in suppressing the reverse and forward leakage current in the MIS diode. In particular, the MIS diode forward current is reduced by 7 orders of magnitude at a forward bias of 1 V compared to a conventional Ni-Au/III-nitride Schottky diode.

  6. Temperature dependent self-compensation in Al- and Ga-doped Mg0.05 Zn0.95 O thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Mavlonov, Abdurashid; Richter, Steffen; von Wenckstern, Holger; Schmidt-Grund, Rüdiger; Lorenz, Michael; Grundmann, Marius

    2016-11-01

    We studied the doping efficiency of Al and Ga dopants in (Mg,Zn)O alloys as a function of the growth temperature and post growth annealing times. High-temperature growth results in the highest structural quality and highest electron mobility; the doping efficiency is limited by the dopant's solubility. It was investigated in detail that a low growth temperature is needed to achieve free carrier densities above the solubility limit of the dopants. Samples grown at temperatures of 300 °C and below have a free carrier density significantly above the solubility limit yielding the minimum resistivity of ρmin=4.8 ×10-4 Ω cm for Mg0.05 Zn0.95 O:Al thin films grown on glass at 300 °C . Annealing of these samples reduces the free carrier density and the absorption edge to values similar to those of samples grown at high temperatures. The saturation of the free carrier density and the optical bandgap at their high temperature growth/annealing values is explained by the thermal creation of acceptor-like compensating defects in thermodynamic equilibrium.

  7. Morphological and microstructural stability of N-polar InAlN thin films grown on free-standing GaN substrates by molecular beam epitaxy

    SciTech Connect

    Hardy, Matthew T. Storm, David F.; Downey, Brian P.; Katzer, D. Scott; Meyer, David J.; McConkie, Thomas O.; Smith, David J.; Nepal, Neeraj

    2016-03-15

    The sensitivity of the surface morphology and microstructure of N-polar-oriented InAlN to variations in composition, temperature, and layer thickness for thin films grown by plasma-assisted molecular beam epitaxy (PAMBE) has been investigated. Lateral compositional inhomogeneity is present in N-rich InAlN films grown at low temperature, and phase segregation is exacerbated with increasing InN fraction. A smooth, step-flow surface morphology and elimination of compositional inhomogeneity can be achieved at a growth temperature 50 °C above the onset of In evaporation (650 °C). A GaN/AlN/GaN/200-nm InAlN heterostructure had a sheet charge density of 1.7 × 10{sup 13 }cm{sup −2} and no degradation in mobility (1760 cm{sup 2}/V s) relative to 15-nm-thick InAlN layers. Demonstration of thick-barrier high-electron-mobility transistors with good direct-current characteristics shows that device quality, thick InAlN layers can be successfully grown by PAMBE.

  8. Structural characterization of niobium oxide thin films grown on SrTiO3 (111) and (La,Sr)(Al,Ta)O3 (111) substrates

    NASA Astrophysics Data System (ADS)

    Dhamdhere, Ajit R.; Hadamek, Tobias; Posadas, Agham B.; Demkov, Alexander A.; Smith, David J.

    2016-12-01

    Niobium oxide thin films have been grown by molecular beam epitaxy on SrTiO3 (STO) (111) and (La0.18Sr0.82)(Al0.59Ta0.41)O3 (LSAT) (111) substrates. Transmission electron microscopy (TEM) confirmed the formation of high quality films with coherent interfaces. Films grown with higher oxygen pressure on STO (111) resulted in a (110)-oriented NbO2 phase with a distorted rutile structure, which can be described as body-centered tetragonal. The a lattice parameter of NbO2 was determined to be ˜13.8 Å in good agreement with neutron diffraction results published in the literature. Films grown on LSAT (111) at lower oxygen pressure produced the NbO phase with a defective rock salt cubic structure. The NbO lattice parameter was determined to be a ≈ 4.26 Å. The film phase/structure identification from TEM was in good agreement with in situ x-ray photoelectron spectroscopy measurements that confirmed the dioxide and monoxide phases, respectively. The atomic structure of the NbO2/STO and NbO/LSAT interfaces was determined based on comparisons between high-resolution electron micrographs and image simulations.

  9. Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers

    NASA Astrophysics Data System (ADS)

    Tupala, Jere; Kemell, Marianna; Härkönen, Emma; Ritala, Mikko; Leskelä, Markku

    2012-03-01

    Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.

  10. Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.

    PubMed

    Tupala, Jere; Kemell, Marianna; Härkönen, Emma; Ritala, Mikko; Leskelä, Markku

    2012-03-30

    Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.

  11. p-type conduction from Sb-doped ZnO thin films grown by dual ion beam sputtering in the absence of oxygen ambient

    SciTech Connect

    Kumar Pandey, Sushil; Kumar Pandey, Saurabh; Awasthi, Vishnu; Kumar, Ashish; Mukherjee, Shaibal; Deshpande, Uday P.; Gupta, Mukul

    2013-10-28

    Sb-doped ZnO (SZO) thin films were deposited on c-plane sapphire substrates by dual ion beam sputtering deposition system in the absence of oxygen ambient. The electrical, structural, morphological, and elemental properties of SZO thin films were studied for films grown at different substrate temperatures ranging from 200 °C to 600 °C and then annealed in situ at 800 °C under vacuum (pressure ∼5 × 10{sup −8} mbar). Films grown for temperature range of 200–500 °C showed p-type conduction with hole concentration of 1.374 × 10{sup 16} to 5.538 × 10{sup 16} cm{sup −3}, resistivity of 66.733–12.758 Ω cm, and carrier mobility of 4.964–8.846 cm{sup 2} V{sup −1} s{sup −1} at room temperature. However, the film grown at 600 °C showed n-type behavior. Additionally, current-voltage (I–V) characteristic of p-ZnO/n-Si heterojunction showed a diode-like behavior, and that further confirmed the p-type conduction in ZnO by Sb doping. X-ray diffraction measurements showed that all SZO films had (002) preferred crystal orientation. X-ray photoelectron spectroscopy analysis confirmed the formation of Sb{sub Zn}–2V{sub Zn} complex caused acceptor-like behavior in SZO films.

  12. High quality nitrogen-doped zinc oxide thin films grown on ITO by sol-gel method

    NASA Astrophysics Data System (ADS)

    Pathak, Trilok Kumar; Kumar, Vinod; Purohit, L. P.

    2015-11-01

    Highly transparent N-doped ZnO thin films were deposited on ITO coated corning glass substrate by sol-gel method. Ammonium nitrate was used as a dopant source of N with varying the doping concentration 0, 0.5, 1.0, 2.0 and 3.0 at%. The DSC analysis of prepared NZO sols is observed a phase transition at 150 °C. X-ray diffraction pattern showed the preferred (002) peak of ZnO, which was deteriorated with increased N concentrations. The transmittance of NZO thin films was observed to be ~88%. The bandgap of NZO thin films increased from 3.28 to 3.70 eV with increased N concentration from 0 to 3 at%. The maximum carrier concentration 8.36×1017 cm-3 and minimum resistivity 1.64 Ω cm was observed for 3 at% N doped ZnO thin films deposited on glass substrate. These highly transparent ZnO thin films can be used as a window layer in solar cells and optoelectronic devices.

  13. Effect of Annealing Temperature on Flowerlike Cu3BiS3 Thin Films Grown by Chemical Bath Deposition

    NASA Astrophysics Data System (ADS)

    Deshmukh, S. G.; Patel, S. J.; Patel, K. K.; Panchal, A. K.; Kheraj, Vipul

    2017-10-01

    For widespread application of thin-film photovoltaic solar cells, synthesis of inexpensive absorber material is essential. In this work, deposition of ternary Cu3BiS3 absorber material, which contains abundant and environmentally benign elements, was carried out on glass substrate. Flowerlike Cu3BiS3 thin films with nanoflakes as building block were formed on glass substrate by chemical bath deposition. These films were annealed at 573 K and 673 K in sulfur ambient for structural improvement. Their structure was characterized using Raman spectroscopy, as well as their surface morphological and optical properties. The x-ray diffraction profile of as-deposited Cu3BiS3 thin film revealed amorphous structure, which transformed to orthorhombic phase after annealing. The Raman spectrum exhibited a characteristic peak at 290 cm-1. Scanning electron microscopy of as-deposited Cu3BiS3 film confirmed formation of nanoflowers with diameter of around 1052 nm. Wettability testing of as-deposited Cu3BiS3 thin film demonstrated hydrophobic nature, which became hydrophilic after annealing. The measured ultraviolet-visible (UV-Vis) absorption spectra of the Cu3BiS3 thin films gave an absorption coefficient of 105 cm-1 and direct optical bandgap of about 1.42 eV after annealing treatment. Based on all these results, such Cu3BiS3 material may have potential applications in the photovoltaic field as an absorber layer.

  14. Effect of Annealing Temperature on Flowerlike Cu3BiS3 Thin Films Grown by Chemical Bath Deposition

    NASA Astrophysics Data System (ADS)

    Deshmukh, S. G.; Patel, S. J.; Patel, K. K.; Panchal, A. K.; Kheraj, Vipul

    2017-06-01

    For widespread application of thin-film photovoltaic solar cells, synthesis of inexpensive absorber material is essential. In this work, deposition of ternary Cu3BiS3 absorber material, which contains abundant and environmentally benign elements, was carried out on glass substrate. Flowerlike Cu3BiS3 thin films with nanoflakes as building block were formed on glass substrate by chemical bath deposition. These films were annealed at 573 K and 673 K in sulfur ambient for structural improvement. Their structure was characterized using Raman spectroscopy, as well as their surface morphological and optical properties. The x-ray diffraction profile of as-deposited Cu3BiS3 thin film revealed amorphous structure, which transformed to orthorhombic phase after annealing. The Raman spectrum exhibited a characteristic peak at 290 cm-1. Scanning electron microscopy of as-deposited Cu3BiS3 film confirmed formation of nanoflowers with diameter of around 1052 nm. Wettability testing of as-deposited Cu3BiS3 thin film demonstrated hydrophobic nature, which became hydrophilic after annealing. The measured ultraviolet-visible (UV-Vis) absorption spectra of the Cu3BiS3 thin films gave an absorption coefficient of 105 cm-1 and direct optical bandgap of about 1.42 eV after annealing treatment. Based on all these results, such Cu3BiS3 material may have potential applications in the photovoltaic field as an absorber layer.

  15. Residual and intentional n-type doping of ZnO thin films grown by metal-organic vapor phase epitaxy on sapphire and ZnO substrates

    NASA Astrophysics Data System (ADS)

    Brochen, Stéphane; Lafossas, Matthieu; Robin, Ivan-Christophe; Ferret, Pierre; Gemain, Frédérique; Pernot, Julien; Feuillet, Guy

    2014-03-01

    ZnO epilayers usually exhibit high n-type residual doping which is one of the reasons behind the difficulties to dope this material p-type. In this work, we aimed at determining the nature of the involved impurities and their potential role as dopant in ZnO thin films grown by metalorganic vapor phase epitaxy (MOVPE) on sapphire and ZnO substrates. In both cases, secondary ion mass spectroscopy (SIMS) measurements give evidence for a strong diffusion of impurities from the substrate to the epilayer, especially for silicon and aluminum. In the case of samples grown on sapphire substrates, aluminum follows Fick's diffusion law on a wide growth temperature range (800-1000°C). Thus, the saturation solubility and the diffusion coefficient of aluminum in ZnO single crystals have been determined. Furthermore, the comparison between SIMS impurity and effective dopant concentrations determined by capacitance-voltage measurements highlights, on one hand a substitutional mechanism for aluminum diffusion, and on the other hand that silicon acts as a donor in ZnO and not as an amphoteric impurity. In addition, photoluminescence spectra exhibit excitonic recombinations at the same energy for aluminum and silicon, indicating that silicon behaves as an hydrogenic donor in ZnO. Based on these experimental observations, ZnO thin films with a controlled n-type doping in the 1016-1019cm-3 range have been carried out. These results show that MOVPE growth is fully compatible with the achievement of highly Al-doped n-type thin films, but also with the growth of materials with low residual doping, which is a crucial parameter to address ZnO p-type doping issues.

  16. Preparation and structure characterization of SmCo{sub 5}(0001) epitaxial thin films grown on Cu(111) underlayers

    SciTech Connect

    Ohtake, Mitsuru; Nukaga, Yuri; Futamoto, Masaaki; Kirino, Fumiyoshi

    2009-04-01

    SmCo{sub 5}(0001) epitaxial films were prepared on Cu(111) single-crystal underlayers formed on Al{sub 2}O{sub 3}(0001) substrates at 500 deg. C. The nucleation and growth mechanism of (0001)-oriented SmCo{sub 5} crystal on Cu(111) underlayer is investigated and a method to control the nucleation is proposed. The SmCo{sub 5} epitaxial thin film formed directly on Cu underlayer consists of two types of domains whose orientations are rotated around the film normal by 30 deg. each other. By introducing a thin Co seed layer on the Cu underlayer, a SmCo{sub 5}(0001) single-crystal thin film is successfully obtained. Nucleation of SmCo{sub 5} crystal on Cu underlayer seems controllable by varying the interaction between the Cu underlayer and the SmCo{sub 5} layer.

  17. Azo-derivatives thin films grown by matrix-assisted pulsed laser evaporation for non-linear optical applications

    NASA Astrophysics Data System (ADS)

    Constantinescu, C.; Matei, A.; Ionita, I.; Ion, V.; Marascu, V.; Dinescu, M.; Vasiliu, C.; Emandi, A.

    2014-05-01

    Azo-dye compounds, in bulk or as thin films, are extensively studied due to their particular optical properties. These properties include non-linear interaction, e.g. two-photon absorption, optical limiting and all-optical poling, with potential applications in optoelectronics and sensors development. Herein, we report on the deposition of pyrazolone derivatives, namely 1-phenyl-3-methyl-4-(1‧-azo-2‧-sodium carboxylate)-pyrazole-5-one thin films, for applications in second harmonic generation. Matrix-assisted pulsed laser evaporation was employed for layers growth, using a Nd:YAG device operating at 266 nm (4ω). The structure and surface morphology of the deposited films were examined by Fourier transform infrared spectroscopy, atomic force microscopy, and scanning electron microscopy. Spectroscopic-ellipsometry was employed to investigate thin film optical properties. Significant second harmonic generation capabilities of the compound were pointed out by using a femtosecond Ti:sapphire laser.

  18. Vertically aligned ZnO nanorods on hot filament chemical vapor deposition grown graphene oxide thin film substrate: solar energy conversion.

    PubMed

    Ameen, Sadia; Akhtar, M Shaheer; Song, Minwu; Shin, Hyung Shik

    2012-08-01

    Vertically aligned zinc oxide (ZnO) nanorods (NRs) were grown by the low-temperature hydrothermal method on graphene oxide (GO) coated FTO substrates, where GO was directly deposited on fluorine doped tin oxide (FTO) substrates using hydrogen (H(2), 65 sccm) and methane (CH(4), 50 sccm) through hot filament chemical vapor deposition (HFCVD) technique. The vertically aligned ZnO NRs were applied as effective photoanode for the fabrication of efficient dye sensitized solar cells (DSSCs). Highly uniform ZnO NRs were grown on GO deposited FTO substrate with the average length of ∼2-4 μm and diameter of ∼200-300 nm. The possible mechanism of grown ZnO NRs clearly revealed the significant role of GO on FTO in architecting the aligned growth of ZnO NRs. The grown vertically aligned ZnO NRs possessed a typical wurtzite hexagonal crystal structure. The structural and the optical studies confirmed the formation of partial hydrogen bonding between surface functional groups of GO and ZnO NRs. A solar-to-electricity conversion efficiency of ∼2.5% was achieved by DSSC fabricated with ZnO NRs deposited on graphene oxide (GO-ZnO NRs) thin film photoanode. The presence of GO on FTO substrate expressively increased the surface area of GO-ZnO photoanode, which resulted in high dye loading as well as high light harvesting efficiency and thus ensued the increased photocurrent density and the improved performance of DSSCs.

  19. Low temperature charge carrier hopping transport mechanism in vanadium oxide thin films grown using pulsed dc sputtering

    NASA Astrophysics Data System (ADS)

    Bharadwaja, S. S. N.; Venkatasubramanian, C.; Fieldhouse, N.; Ashok, S.; Horn, M. W.; Jackson, T. N.

    2009-06-01

    Low temperature charge transport in vanadium oxide (VOx) thin films processed using pulsed dc sputtering is investigated to understand the correlation between the processing conditions and electrical properties. It is identified that the temperature dependent resistivity ρ(T ) of the VOx thin films is dominated by a Efros-Shklovskii variable range hopping mechanism [Efros and Shklovskii, J. Phys. C 8, L49 (1975)]. A detailed analysis in terms of charge hopping parameters in the low temperature regime is used to correlate film properties with the pulsed dc sputtering conditions.

  20. Surface properties of nanostructured NiO undergoing electrochemical oxidation in 3-methoxy-propionitrile

    NASA Astrophysics Data System (ADS)

    Bonomo, Matteo; Marrani, Andrea Giacomo; Novelli, Vittoria; Awais, Muhammad; Dowling, Denis P.; Vos, Johannes G.; Dini, Danilo

    2017-05-01

    Nanostructured nickel oxide (NiO) was deposited in the configuration of thin film (thickness, l = 2-6 μm) onto fluorine-doped tin oxide (FTO) substrates via plasma-assisted rapid discharge sintering (RDS). Electrochemical cycling of RDS NiO in 3-methoxy-propionitrile (3-MPN) revealed two characteristic peaks of NiO oxidation which were associated to the surface-confined redox processes Ni(II) → Ni(III) and Ni(III) → Ni(IV). Grazing angle X-ray photoelectron spectroscopy (XPS) was conducted ex-situ on NiO electrodes in both pristine and oxidized states. Oxidized NiO samples for XPS experiments were obtained in the potentiostatic mode through the polarization of NiO at its two characteristic potentials of oxidation. The XPS analysis allowed to ascertain the electronic structure of the nanoporous NiO framework, and verify the adsorption of perchlorate and chloride anions onto NiO surface due to the compensation of the charge stored in oxidized NiO. XPS also revealed that the spectrum within the region characteristic of Ni 2p ionization does not vary considerably with the state of charge of the nickel centres. This finding is in evident contrast to what has been observed for the same system when it undergoes electrochemical oxidation in aqueous electrolyte.

  1. On the dielectric and optical properties of surface-anchored metal-organic frameworks: A study on epitaxially grown thin films

    NASA Astrophysics Data System (ADS)

    Redel, Engelbert; Wang, Zhengbang; Walheim, Stefan; Liu, Jinxuan; Gliemann, Hartmut; Wöll, Christof

    2013-08-01

    We determine the optical constants of two highly porous, crystalline metal-organic frameworks (MOFs). Since it is problematic to determine the optical constants for the standard powder modification of these porous solids, we instead use surface-anchored metal-organic frameworks (SURMOFs). These MOF thin films are grown using liquid phase epitaxy (LPE) on modified silicon substrates. The produced SURMOF thin films exhibit good optical properties; these porous coatings are smooth as well as crack-free, they do not scatter visible light, and they have a homogenous interference color over the entire sample. Therefore, spectroscopic ellipsometry (SE) can be used in a straightforward fashion to determine the corresponding SURMOF optical properties. After careful removal of the solvent molecules used in the fabrication process as well as the residual water adsorbed in the voids of this highly porous solid, we determine an optical constant of n = 1.39 at a wavelength of 750 nm for HKUST-1 (stands for Hong Kong University of Science and Technology-1; and was first discovered there) or [Cu3(BTC)2]. After exposing these SURMOF thin films to moisture/EtOH atmosphere, the refractive index (n) increases to n = 1.55-1.6. This dependence of the optical properties on water/EtOH adsorption demonstrates the potential of such SURMOF materials for optical sensing.

  2. Electron microscopy study of MOCVD-grown TiO sub 2 thin films and TiO sub 2 /Al sub 2 O sub 3 interfaces

    SciTech Connect

    Gao, Y.; Merkle, K.L.; Chang, H.L.M.; Zhang, T.J.; Lam, D. J.

    1990-11-01

    TiO{sub 2} thin films grown on (11{bar 2}0) sapphire at 800{degree}C by the MOCVD technique have been characterized by transmission electron microscopy. The TiO{sub 2} thin films are single crystalline and have the rutile structure. The epitaxial orientation relationship between the TiO{sub 2} thin films (R) and the substrate (S) has been found to be: (101)(0{bar 1}0){sub R}{parallel}(11{bar 2}0)(0001){sub S}. Growth twins in the films are commonly observed with the twin plane {l brace}101{r brace} and twinning direction {l angle}011{r angle}. Detailed atomic structures of the twin boundaries and TiO{sub 2}/{alpha}-Al{sub 2}O{sub 3} interfaces have been investigated by high-resolution electron microscopy (HREM). When the interfaces are viewed in the direction of (0{bar 1}0){sub R}/(0001){sub S}, the interfaces are found to be structurally coherent in the direction of ({bar 1}01){sub R}/(1{bar 1}00){sub S}, in which the lattice mismatch at the interfaces is about 0.5%. 8 refs., 4 figs.

  3. High performance FeSe0.5Te0.5 thin films grown at low temperature by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Yuan, Pusheng; Xu, Zhongtang; Zhang, Haitao; Wang, Dongliang; Ma, Yanwei; Zhang, Ming; Li, Jianqi

    2015-06-01

    We report on fully epitaxial FeSe0.5Te0.5 (FST) thin films of high quality grown on CaF2 (00l) substrate at a low temperature of 300 °C by pulsed laser deposition. The transport Jc of thin films is up to 1.36 MA cm-2 in self-field and 0.97 MA cm-2 in 9 T at 4.2 K, indicating very weak field dependence. A near isotropy of Jc (γ = JcH//ab/JcH//c) as low as 1.09 at 9 T is achieved in the FST thin films. Moreover, there is no clear amorphous interfacial layer between the film and the substrate, probably due to low temperature and low laser repetition rate, while the thickness of the reaction layer is approximate 5 nm in many other works. The transmission electron microscopy evidence shows that some lattices with lateral size <5 nm × 20 nm seem to be disturbed. These location defects are thought to be responsible for the nearly isotropic behavior of the superconductivity.

  4. Characterization of nanostructured photosensitive (NiS){sub x}(CdS){sub (1-x)} composite thin films grown by successive ionic layer adsorption and reaction (SILAR) route

    SciTech Connect

    Ubale, A.U.; Bargal, A.N.

    2011-07-15

    Highlights: {yields} Thin films of (NiS){sub x}(CdS){sub (1-x)} with variable composition (x = 1 to 0) were deposited onto glass substrates by the successive ionic layer adsorption and reaction (SILAR) method. {yields} The structural, surface morphological and electrical characterizations of the as deposited and annealed films were studied. {yields} The bandgap and activation energy of annealed (NiS){sub x}(CdS){sub (1-x)} film decrease with improvement in photosensitive nature. -- Abstract: Recently ternary semiconductor nanostructured composite materials have attracted the interest of researchers because of their photovoltaic applications. Thin films of (NiS){sub x}(CdS){sub (1-x)} with variable composition (x = 1-0) had been deposited onto glass substrates by the successive ionic layer adsorption and reaction (SILAR) method. As grown and annealed films were characterised by X-ray diffraction, scanning electron microscopy and EDAX to investigate structural and morphological properties. The (NiS){sub x}(CdS){sub (1-x)} films were polycrystalline in nature having mixed phase of rhombohedral and hexagonal crystal structure due to NiS and CdS respectively. The optical and electrical properties of (NiS){sub x}(CdS){sub (1-x)} thin films were studied to determine compsition dependent bandgap, activation energy and photconductivity. The bandgap and activation energy of annealed (NiS){sub x}(CdS){sub (1-x)} film decrease with improvement in photosensitive nature.

  5. Interaction of oxygen with samarium on Al{sub 2}O{sub 3} thin film grown on Ni{sub 3}Al(111)

    SciTech Connect

    Cheng, Dingling; Xu, Qian E-mail: jfzhu@ustc.edu.cn; Han, Yong; Ye, Yifan; Pan, Haibin; Zhu, Junfa E-mail: jfzhu@ustc.edu.cn

    2014-03-07

    The interaction between oxygen and samarium (Sm) on the well-ordered thin Al{sub 2}O{sub 3} film grown on Ni{sub 3}Al(111) has been investigated by X-ray photoelectron spectroscopy and synchrotron radiation photoemission spectroscopy. At Sm coverage higher than one monolayer, exposure of oxygen to the Sm films at room temperature leads to the formation of both samarium peroxide (O{sub 2}{sup 2−}) states and regular samarium oxide (O{sup 2−}) states. By contrast, when exposing O{sub 2} to Sm film less than one monolayer on Al{sub 2}O{sub 3}, no O{sub 2}{sup 2−} can be observed. Upon heating to higher temperatures, these metastable O{sub 2}{sup 2−} states dissociate, supplying active O atoms which can diffuse through the Al{sub 2}O{sub 3} thin film to further oxidize the underlying Ni{sub 3}Al(111) substrate, leading to the significant increase of the Al{sub 2}O{sub 3} thin film thickness. Therefore, it can be concluded that Sm, presumably in its peroxide form, acts as a catalyst for the further oxidation of the Ni{sub 3}Al substrate by supplying the active oxygen species at elevated temperatures.

  6. Magnetotransport phenomena in Bi{sub 2}Se{sub 3} thin film topological insulators grown by hybrid physical chemical vapor deposition

    SciTech Connect

    Kumar, Raj; Hunte, Frank; Brom, Joseph E.; Redwing, Joan M.

    2015-02-14

    Intrinsic defects in Bi{sub 2}Se{sub 3} topological insulators tend to produce a high carrier concentration and current leakage through the bulk material. Bi{sub 2}Se{sub 3} thin films were grown by hybrid physical chemical vapor deposition on (0001) Al{sub 2}O{sub 3} substrates with high Se vapor pressure to reduce the occurrence of Se vacancies as the main type of defect. Consequently, the carrier concentration was reduced to ∼5.75 × 10{sup 18} cm{sup −3} comparable to reported carrier concentration in Bi{sub 2}Se{sub 3} thin films. Magnetotransport measurements were performed on the films and the data were analyzed for weak anti-localization using the Hikami-Larkin-Nagaoka model. The estimated α and l{sub ϕ} values showed good agreement with the symplectic case of 2-D transport of topological surface states in the quantum diffusion regime. The temperature and angular dependence of magnetoresistance indicate a large contribution of the 2-D surface carriers to overall transport properties of Bi{sub 2}Se{sub 3} thin film.

  7. Stabilizing Ir(001) Epitaxy on Yttria-Stabilized Zirconia Using a Thin Ir Seed Layer Grown by Pulsed Laser Deposition

    SciTech Connect

    Fan, Lisha; Jacobs, Christopher B.; Rouleau, Christopher M.; Eres, Gyula

    2016-11-18

    In this paper, we demonstrate the reproducible epitaxial growth of 100 nm thick Ir(001) films on a heteroepitaxial stack consisting of 5 nm Ir and 100 nm yttria-stabilized zirconia (YSZ) grown on Si(001) substrates. It is shown that a 5 nm thick Ir layer grown by pulsed laser deposition in the same chamber as the YSZ film without breaking the vacuum is the key to stabilizing Ir(001) epitaxial growth. Growth of the Ir seed layer with pure (001) orientation occurs only in a narrow growth temperature window from 550 to 750 °C, and the fraction of Ir(111) increases at substrate temperatures outside of this window. The Ir seed layer prevents exposure of the YSZ film to air during sample transfer and enables highly reproducible Ir(001) heteroepitaxy on YSZ buffered Si(001). In contrast, if Ir is grown directly on a bare YSZ layer that was exposed to ambient conditions, the films are prone to change orientation to (111). These results reveal that preserving the chemical and structural purity of the YSZ surface is imperative for achieving Ir(001) epitaxy. The narrow range of the mosaic spread values from eight experiments demonstrates the high yield and high reproducibility of Ir(001) heteroepitaxy by this approach. Lastly, the improved Ir(001) epitaxial growth method is of great significance for integrating a variety of technologically important materials such as diamond, graphene, and functional oxides on a Si platform.

  8. Stabilizing Ir(001) Epitaxy on Yttria-Stabilized Zirconia Using a Thin Ir Seed Layer Grown by Pulsed Laser Deposition

    DOE PAGES

    Fan, Lisha; Jacobs, Christopher B.; Rouleau, Christopher M.; ...

    2016-11-18

    In this paper, we demonstrate the reproducible epitaxial growth of 100 nm thick Ir(001) films on a heteroepitaxial stack consisting of 5 nm Ir and 100 nm yttria-stabilized zirconia (YSZ) grown on Si(001) substrates. It is shown that a 5 nm thick Ir layer grown by pulsed laser deposition in the same chamber as the YSZ film without breaking the vacuum is the key to stabilizing Ir(001) epitaxial growth. Growth of the Ir seed layer with pure (001) orientation occurs only in a narrow growth temperature window from 550 to 750 °C, and the fraction of Ir(111) increases at substratemore » temperatures outside of this window. The Ir seed layer prevents exposure of the YSZ film to air during sample transfer and enables highly reproducible Ir(001) heteroepitaxy on YSZ buffered Si(001). In contrast, if Ir is grown directly on a bare YSZ layer that was exposed to ambient conditions, the films are prone to change orientation to (111). These results reveal that preserving the chemical and structural purity of the YSZ surface is imperative for achieving Ir(001) epitaxy. The narrow range of the mosaic spread values from eight experiments demonstrates the high yield and high reproducibility of Ir(001) heteroepitaxy by this approach. Lastly, the improved Ir(001) epitaxial growth method is of great significance for integrating a variety of technologically important materials such as diamond, graphene, and functional oxides on a Si platform.« less

  9. Characteristics of Fluorine-doped tin oxide thin films grown by Streaming process for Electrodeless Electrochemical Deposition

    NASA Astrophysics Data System (ADS)

    Yusuf, Gbadebo; Khalilzadeh-Rezaie, Farnood; Cleary, Justin W.; Oladeji, Isaiah O.; Suu, Koukou; Schoenfeld, Winston V.; Peale, Robert E.; Awodugba, Ayodeji O.

    2015-04-01

    This work investigated the characteristics of SnO2: F films grown by Streaming Process for Electrodeless Electrochemical Deposition (SPEED). Stannic chloride (SnCl4) and ammonium fluoride (NH4 F) was dissolved in a mixture of deionized water and organic solvents. The preheated substrate temperature was varied between 450 and 530° C. High quality SnO2: F films were grown at all the substrate temperatures studied. The typical film thickness was 250 nm. XRD shows that the grown films are polycrystalline SnO2 with a tetragonal crystal structure. The average optical transmission of the films was around 93% throughout the wavelength of 400 to 1000 nm. The lowest electrical resistivity achieved was 6 x 10-4 Ω cm. The Hall measurements showed that the film is an n-type semiconductor, with the highest carrier mobility of 8.3 cm2/V.s, and concentration of 1 x 1021 cm-3. The direct band gap was determined to be 4 eV from the transmittance spectrum.

  10. Structural and optical properties of La-doped BaSnO3 thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    James, K. K.; Krishnaprasad, P. S.; Hasna, K.; Jayaraj, M. K.

    2015-01-01

    In this study the structural and optical properties of lanthanum-doped BaSnO3 powder samples and thin films deposited on fused silica were investigaed using laser ablation. Under an oxygen pressure of 5×10-4 mbar, phase pure BaSnO3 films with a lattice constant of 0.417 nm and grain size of 21 nm were prepared at 630 °C. The band gap of BaSnO3 powder sample and thin films was calculated to be 3.36 eV and 3.67 eV, respectively. There was a progressive increase in conductivity for thin films of BaSnO3 doped with 0~7 at% of La. The highest conductivity, 9 Scm-1, was obtained for 7 at% La-doped BaSnO3. Carrier concentration, obtained from Burstein-Moss (B-M) shift, nearly matches the measured values except for 3 at% and 10 at% La-doped BaSnO3 thin films.

  11. Effects of pH on the characteristics of ZnS thin films grown by using the CBD method

    NASA Astrophysics Data System (ADS)

    Ahn, Heejin; Lee, Dongchan; Park, Sujung; Um, Youngho

    In CIGS-based thin film solar cells, a chemically deposited ZnS buffer layer with high resistivity is generally used between the absorber layer and transparent conducting oxide layer. In this work, we report a chemical process to prepare ZnS films by the CBD technique based on the typical bath deposition. The influences of ammonia (NH4OH) and Na2EDTA (Na2C10H16N2O8) as complexing agents on structural, morphological, and optical properties of ZnS thin films are investigated ranging pH concentration from 5 to 10. To investigate effects of pH on the characteristics of ZnS thin films, by using UV-visible transmittance, atomic force microscopy, and optical absorption were investigated. With changing the pH range, the ZnS thin films demonstrate high transmittance of 75~80% in the visible region, indicating the films are potentially useful in photovoltaic applications. The results will be presented in detail. This research was supported by Basic Science Research Program through the National Research Foundation of Korea(NRF) funded by the Ministry of Education (2011-0024709).

  12. Roughness analysis applied to niobium thin films grown on MgO(001) surfaces for superconducting radio frequency cavity applications

    SciTech Connect

    Beringer, D. B.; Roach, W. M.; Clavero, C.; Reece, C. E.; Lukaszew, R. A.

    2013-02-05

    This paper describes surface studies to address roughness issues inherent to thin film coatings deposited onto superconducting radio frequency (SRF) cavities. This is particularly relevant for multilayered thin film coatings that are being considered as a possible scheme to overcome technical issues and to surpass the fundamental limit of ~500 MV/m accelerating gradient achievable with bulk niobium. In 2006, a model by Gurevich [ Appl. Phys. Lett. 88 012511 (2006)] was proposed to overcome this limit that involves coating superconducting layers separated by insulating ones onto the inner walls of the cavities. Thus, we have undertaken a systematic effort to understand the dynamic evolution of the Nb surface under specific deposition thin film conditions onto an insulating surface in order to explore the feasibility of the proposed model. We examine and compare the morphology from two distinct Nb/MgO series, each with its own epitaxial registry, at very low growth rates and closely examine the dynamical scaling of the surface features during growth. Further, we apply analysis techniques such as power spectral density to the specific problem of thin film growth and roughness evolution to qualify the set of deposition conditions that lead to successful SRF coatings.

  13. Control of Phase, Structural and Optical Properties of Tin Sulfide Nanostructured Thin Films Grown via Chemical Bath Deposition

    NASA Astrophysics Data System (ADS)

    Mahdi, Mohamed S.; Ibrahim, K.; Hmood, Arshad; Ahmed, Naser M.; Mustafa, Falah I.

    2017-02-01

    In this study, nanostructured tin sulfide (SnS) thin films were synthesized on glass substrates by means of low-cost chemical bath deposition using non-toxic trisodium citrate (TSC) as complexing agent. The influence of varying molar concentration of TSC (0.15-0.21 M) on the tin sulfide phases was investigated. The structural, morphological and optical properties of the films were studied using x-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), Raman spectroscopy and optical absorption spectroscopy. The XRD patterns confirmed an orthorhombic polycrystalline structure of the as-prepared SnS thin films. The values of average crystalline size and texture coefficient of the major XRD peak increased with increasing TSC concentration. The FESEM micrographs revealed that the synthesized thin films are characterized by a flake-stack structure. The Raman spectra of the films showed the presence of a Sn2S3 peak, which gradually declined in intensity until almost disappearing as the TSC concentration increased from 0.15 M to 0.21 M. The direct energy band gaps estimated from ultraviolet-visible-near-infrared absorption spectra also varied between 1.64 eV to 1.1 eV with increasing TSC concentration from 0.15 M to 0.21 M. The results indicate the crucial role of TSC in the synthesis of SnS nanostructured thin films.

  14. Microstructure and magnetic properties of FeCo epitaxial thin films grown on MgO single-crystal substrates

    SciTech Connect

    Shikada, Kouhei; Ohtake, Mitsuru; Futamoto, Masaaki; Kirino, Fumiyoshi

    2009-04-01

    FeCo epitaxial films were prepared on MgO(100), MgO(110), and MgO(111) substrates by ultrahigh vacuum molecular beam epitaxy. FeCo thin films with (100), (211), and (110) planes parallel to the substrate surface grow on respective MgO substrates. FeCo/MgO interface structures are studied by high-resolution cross-sectional transmission electron microscopy and the epitaxial growth mechanism is discussed. Atomically sharp boundaries are recognized between the FeCo thin films and the MgO substrates where misfit dislocations are introduced in the FeCo thin films presumably to decrease the lattice misfits. Misfit dislocations are observed approximately every 9 and 1.4 nm in FeCo thin film at the FeCo/MgO(100) and the FeCo/MgO(110) interfaces, respectively. X-ray diffraction analysis indicates that the lattice spacing measured parallel to the single-crystal substrate surfaces are in agreement within 0.1% with those of the respective bulk values of Fe{sub 50}Co{sub 50} alloy crystal, showing that the FeCo film strain is very small. The magnetic anisotropies of these epitaxial films basically reflect the magnetocrystalline anisotropy of bulk FeCo alloy crystal.

  15. Control of Phase, Structural and Optical Properties of Tin Sulfide Nanostructured Thin Films Grown via Chemical Bath Deposition

    NASA Astrophysics Data System (ADS)

    Mahdi, Mohamed S.; Ibrahim, K.; Hmood, Arshad; Ahmed, Naser M.; Mustafa, Falah I.

    2017-07-01

    In this study, nanostructured tin sulfide (SnS) thin films were synthesized on glass substrates by means of low-cost chemical bath deposition using non-toxic trisodium citrate (TSC) as complexing agent. The influence of varying molar concentration of TSC (0.15-0.21 M) on the tin sulfide phases was investigated. The structural, morphological and optical properties of the films were studied using x-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), Raman spectroscopy and optical absorption spectroscopy. The XRD patterns confirmed an orthorhombic polycrystalline structure of the as-prepared SnS thin films. The values of average crystalline size and texture coefficient of the major XRD peak increased with increasing TSC concentration. The FESEM micrographs revealed that the synthesized thin films are characterized by a flake-stack structure. The Raman spectra of the films showed the presence of a Sn2S3 peak, which gradually declined in intensity until almost disappearing as the TSC concentration increased from 0.15 M to 0.21 M. The direct energy band gaps estimated from ultraviolet-visible-near-infrared absorption spectra also varied between 1.64 eV to 1.1 eV with increasing TSC concentration from 0.15 M to 0.21 M. The results indicate the crucial role of TSC in the synthesis of SnS nanostructured thin films.

  16. Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Wei, Yaowei; Liu, Hao; Sheng, Ouyang; Liu, Zhichao; Chen, Songlin; Yang, Liming

    2011-08-01

    Research on thin film deposited by atomic layer deposition (ALD) for laser damage resistance is rare. In this paper, it has been used to deposit TiO2/Al2O3 films at 110° C and 280° C on fused silica and BK7 substrates. Microstructure of the thin films was investigated by x-ray diffraction. The laser-induced damage threshold (LIDT) of samples was measured by a damage test system. Damage morphology was studied under a Nomarski differential interference contrast microscope and further checked under an atomic force microscope. Multilayers deposited at different temperatures were compared. The results show that the films deposited by ALD had better uniformity and transmission; in this paper, the uniformity is better than 99% over 100mm Φ samples, and the transmission is more than 99.8% at 1064nm. Deposition temperature affects the deposition rate and the thin film microstructure and further influences the LIDT of the thin films. As to the TiO2/Al2O3 films, the LIDTs were 6.73±0.47J/cm2 and 6.5±0.46J/cm2 at 110° C on fused silica and BK7 substrates, respectively. The LIDTs at 110° C are notably better than 280° C.

  17. Atomic structure relaxation in nanocrystalline NiO studied by EXAFS spectroscopy: Role of nickel vacancies

    NASA Astrophysics Data System (ADS)

    Anspoks, A.; Kalinko, A.; Kalendarev, R.; Kuzmin, A.

    2012-11-01

    Nanocrystalline NiO samples have been studied using the Ni K-edge extended x-ray absorption fine structure (EXAFS) spectroscopy and recently developed modeling technique, combining classical molecular dynamics with ab initio multiple-scattering EXAFS calculations (MD-EXAFS). Conventional analysis of the EXAFS signals from the first two coordination shells of nickel revealed that (i) the second shell average distance R(Ni-Ni2) expands in nanocrystalline NiO compared to microcrystalline NiO, in agreement with overall unit cell volume expansion observed by x-ray diffraction; (ii) on the contrary, the first shell average distance R(Ni-O1) in nanocrystalline NiO shrinks compared to microcrystalline NiO; (iii) the thermal contribution into the mean-square relative displacement σ2 is close in both microcrystalline and nanocrystalline NiO and can be described by the Debye model; (iv) the static disorder is additionally present in nanocrystalline NiO in both the first Ni-O1 and second Ni-Ni2 shells due to nanocrystal structure relaxation. Within the MD-EXAFS method, the force-field potential models have been developed for nanosized NiO using as a criterion the agreement between the experimental and theoretical EXAFS spectra. The best solutions have been obtained for the 3D cubic-shaped nanoparticle models with nonzero Ni vacancy concentration Cvac: Cvac≈0.4-1.2% for NiO nanoparticles having the cube size of L≈3.6-4.2 nm and Cvac≈1.6-2.0% for NiO thin film composed of cubic nanograins with a size of L≈1.3-2.1 nm. Thus our results show that the Ni vacancies in nanosized NiO play important role in its atomic structure relaxation along with the size reduction effect.

  18. Thin, high quality GaInP compositionally graded buffer layers grown at high growth rates for metamorphic III-V solar cell applications

    NASA Astrophysics Data System (ADS)

    Garcia, I.; France, R. M.; Geisz, J. F.; Simon, J.

    2014-05-01

    The metamorphic growth of lattice-mismatched materials has allowed optimizing the bandgap combination in multijunction solar cells for the solar spectrum under consideration. Buffer structures are used to accommodate the lattice-mismatch by introducing dislocations and relaxing the material in a controlled way. However, the metamorphic buffers typically involve significant growth time and material usage, which increases the cost of these solar cells. In this work, the thinning of buffer structures with continuously, linearly graded misfit is addressed with the goal of increasing the cost-effectiveness of metamorphic multijunction solar cells. The relaxation dynamics and quality of the buffer layers analyzed were assessed by in-situ stress measurements and ex-situ measurements of residual strain, threading dislocation density and surface roughness. Their ultimate quality has been tested using these buffers as templates for the growth of 1 eV Ga0.73In0.27As solar cells. The deleterious effect of thinning the grade layer of these buffer structures from 2 to 1 μm was investigated. It is shown that prompting the relaxation of the buffer by using a stepwise misfit jump at the beginning of the grade layer improves the quality of the thinned buffer structure. The residual threading dislocation density of the optimized thin buffers, grown at a high growth rate of 7 μm/h, is 3×106 cm-2, and solar cells on these buffers exhibit near-ideal carrier collection efficiency and a Voc of 0.62 V at 1-sun direct terrestrial spectrum.

  19. Optical and electrical characterization of CdS-Glycine thin films with ammonia free buffer grown at different temperatures for solar cells applications

    NASA Astrophysics Data System (ADS)

    Berman-Mendoza, D.; Quiñones-Urías, D.; Ferra-González, S.; Vera-Marquina, A.; Rojas-Hernández, A.; Gómez Fuentes, R.; García-Juárez, A.; Leal-Cruz, A. L.; Ramos-Carrasco, A.

    2013-11-01

    In this work we report the fabrication and electro-optical characterization of CdS thin films using glycine as complexing agent with ammonia and ammonia free buffer by the Chemical Bath Deposition (CBD) method. The CdS thin films were grown at different temperatures of 50, 60, 70 and 80 °C in a thermal water bath. The morphology of these films was determined using atomic force microscopy; the resultant films were homogeneous, well adhered to the substrate, and specularly reflecting with a varying color depending on the deposition temperature. Transmittance and reflectance measurements of thermally treated CdS films were carried to study the effect of the ammonia buffer on its optical properties and bandgap. The crystallinity of the CdS thin films was determined by means of X Ray diffraction measurements. Therefore, for this study, an ammonia-free complexing agent has been taken for the deposition of CdS. Among different methods, which are being used for the preparation of CdS films, Chemical Bath Deposition (CBD) is the most attractive due to its low cost, easy to handle and large possibilities regarding doping and deposition on various substrates. In particular it can be used to easily obtain field effect devices by depositing CdS thin films over a SiO2/Si substrate. Heterostructures with interesting physical properties can be imagined, realized and tested in this way.. Structures CdS/PbS also were realized and have shown good solar cell characteristics.

  20. Tuning the metal-insulator transition via epitaxial strain and Co doping in NdNiO{sub 3} thin films grown by polymer-assisted deposition

    SciTech Connect

    Yao, Dan; Shi, Lei Zhou, Shiming; Liu, Haifeng; Zhao, Jiyin; Li, Yang; Wang, Yang

    2016-01-21

    The epitaxial NdNi{sub 1-x}Co{sub x}O{sub 3} (0 ≤ x ≤ 0.10) thin films on (001) LaAlO{sub 3} and (001) SrTiO{sub 3} substrates were grown by a simple polymer-assisted deposition technique. The co-function of the epitaxial strain and Co doping on the metal-insulator transition in perovskite nickelate NdNiO{sub 3} thin films is investigated. X-ray diffraction and scanning electron microscopy reveal that the as-prepared thin films exhibit good crystallinity and heteroepitaxy. The temperature dependent resistivities of the thin films indicate that both the epitaxial strain and Co doping lower the metal-insulator (MI) transition temperature, which can be treated as a way to tune the MI transition. Furthermore, under the investigated Co-doping levels, the MI transition temperature (T{sub MI}) shifts to low temperatures with Co content increasing under both compressive and tensile strain, and the more distinction is in the former situation. When x is increased up to 0.10, the insulating phase is completely suppressed under the compressive strain. With the strain increases from compression to tension, the resistivities are enhanced both in the metal and insulating regions. However, the Co-doping effect on the resistivity shows a more complex situation. As Co content x increases from zero to 0.10, the resistivities are reduced both in the metal and insulating regions under the tensile strain, whereas they are enhanced in the high-temperature metal region under the compressive strain. Based on the temperature dependent resistivity in the metal regions, it is suggested that the electron-phonon coupling in the films becomes weaker with the increase of both the strain and Co-doping.

  1. Compositional inhomogeneities in AlGaN thin films grown by molecular beam epitaxy: Effect on MSM UV photodetectors

    NASA Astrophysics Data System (ADS)

    Pramanik, Pallabi; Sen, Sayantani; Singha, Chirantan; Roy, Abhra Shankar; Das, Alakananda; Sen, Susanta; Bhattacharyya, A.

    2016-10-01

    Ultraviolet (UV) MSM photodetectors (PD) based on AlGaN alloys find many applications, including flame sensing. In this work we investigate the dependence of AlGaN based photodetectors grown by MBE on the kinetics of growth. MSM photodetectors were fabricated in the interdigitated configuration with Ni/Au contacts having 400 μm finger length and 10 μm finger spacing. Bulk Al0.4Ga0.6N films were grown on to sapphire substrates using an AlN buffer layer. A series of PDs were developed using the Al0.4Ga0.6N films grown under different group III/V flux ratios ranging from stoichiometric conditions to much higher than unity. Upon testing, it was observed that the otherwise identical photodetectors show significant decrease in dark current as AlGaN deposition conditions change from stoichiometric to excess group III, due to reduction of unintentional incorporation of oxygen-related point defects. In addition, the intensity and spectral dependence of the photocurrent also change, showing an extended low energy tail for the former and a sharp and prominent excitonic peak for the latter. The optical transmission measurements indicate a variation in Urbach energy with deposition conditions of the AlGaN films, although they have the same absorption edge. While all samples show a single red-shifted photoluminescence peak at room temperature, upon cooling, multiple higher energy peaks appear in the photoluminescence (PL) spectra, indicating that the alloys contain complex compositional inhomogeneities. Two types of alloy fluctuations, determined by the growth conditions, have been identified that modulate the optoelectronic properties of AlGaN by changing the spatial localization of excitons, thereby altering their stability. We identified that growth under stoichiometric conditions leads to compositional inhomogeneities that play a detrimental role in the operation of MSM photodetectors, which reduces the sharpness of the sensitivity edge, while growth under excess metal

  2. Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Mahdhi, H.; Ayadi, Z. Ben; Gauffier, J. L.; Djessas, K.

    2016-01-01

    Transparent conducting thin films of ZnO:Ga (GZO) have been deposited onto glass substrates and were prepared by RF-magnetron sputtering from nanoparticles synthesized by the sol-gel method. The preheated substrate temperature was changed from room temperature to 300°C. X-ray diffraction spectra showed that the as-deposited films are polycrystalline ZnO with a hexagonal wurtzite structure. Surface morphology, optical properties (such as transmission, reflectance), and conductivity were investigated. The obtained results revealed that the structures and properties of the films were greatly affected by the substrate temperature. Thin films of GZO have a low resistivity, with a minimum value of 2.20 × 10-3 Ω cm deposited at a substrate temperature of 200°C.

  3. H2 S Sensors: Fumarate-Based fcu-MOF Thin Film Grown on a Capacitive Interdigitated Electrode.

    PubMed

    Yassine, Omar; Shekhah, Osama; Assen, Ayalew H; Belmabkhout, Youssef; Salama, Khaled N; Eddaoudi, Mohamed

    2016-12-19

    Herein we report the fabrication of an advanced sensor for the detection of hydrogen sulfide (H2 S) at room temperature, using thin films of rare-earth metal (RE)-based metal-organic framework (MOF) with underlying fcu topology. This unique MOF-based sensor is made via the in situ growth of fumarate-based fcu-MOF (fum-fcu-MOF) thin film on a capacitive interdigitated electrode. The sensor showed a remarkable detection sensitivity for H2 S at concentrations down to 100 ppb, with the lower detection limit around 5 ppb. The fum-fcu-MOF sensor exhibits a highly desirable detection selectivity towards H2 S vs. CH4 , NO2 , H2 , and C7 H8 as well as an outstanding H2 S sensing stability as compared to other reported MOFs. © 2016 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

  4. Comparative Study of Thermal Stability of NiFe and NiFeTa Thin Films Grown by Cosputtering Technique

    NASA Astrophysics Data System (ADS)

    Phuoc, Nguyen N.; Ong, C. K.

    2016-08-01

    A comparative study of the thermal behavior of dynamic permeability spectra for compositionally graded NiFeTa and uniform-composition NiFe thin films has been carried out. We found that the resonance frequency of the compositionally graded NiFeTa film increased with increasing temperature, while it decreased for the case of the uniform-composition NiFe thin film. This finding unambiguously suggests that the compositional gradient of the film is the only reason for the increase of the magnetic anisotropy with temperature due to its stress-induced origin, while the cosputtering technique does not play any role in this peculiar behavior. The temperature dependence of the frequency linewidth is also presented and discussed.

  5. Influence of oxygen flow rate on metal-insulator transition of vanadium oxide thin films grown by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Ma, Xu; Liu, Xinkun; Li, Haizhu; Zhang, Angran; Huang, Mingju

    2017-03-01

    High-quality vanadium oxide ( VO2) films have been fabricated on Si (111) substrates by radio frequency (RF) magnetron sputtering deposition method. The sheet resistance of VO2 has a significant change (close to 5 orders of magnitude) in the process of the metal-insulator phase transition (MIT). The field emission-scanning electron microscope (FE-SEM) results show the grain size of VO2 thin films is larger with the increase of oxygen flow. The X-ray diffraction (XRD) results indicate the thin films fabricated at different oxygen flow rates grow along the (011) crystalline orientation. As the oxygen flow rate increases from 3 sccm to 6 sccm, the phase transition temperature of the films reduces from 341 to 320 K, the width of the thermal hysteresis loop decreases from 32 to 9 K. The thin films fabricated in the condition of 5 sccm have a high temperature coefficient of resistance (TCR) -3.455%/K with a small resistivity of 2.795 ρ/Ω cm.

  6. Control of the magnetic properties of LaMnO3 epitaxial thin films grown by Pulsed Laser Deposition

    NASA Astrophysics Data System (ADS)

    Martinez, Benjamin; Roqueta, Jaume; Pomar, Alberto; Balcells, Lluis; Frontera, Carlos; Konstantinovic, Zorica; Sandiumenge, Felip; Santiso, Jose; Advanced materials characterization Team; Thin films growth Team

    2015-03-01

    LaMnO3 (LMO), the parent compound of colossal magnetoresistance based manganites has gained renewed attention as a building block in heterostructures with unexpected properties. In its bulk phase, stoichiometric LMO is an A-type antiferromagnetic (AFM) insulator (TN = 140K) with orthorhombic structure that easily accommodate an oxygen excess by generating cationic (La or Mn) vacancies. As a result, a fraction of Mn 3+ changes to Mn 4+ leading to a double-exchange mediated ferromagnetic (FM) behavior. In thin films the AFM phase has been elusive up to now and thin films with FM ordering are usually reported. In this work, we have systematically studied the growth process of LaMnO3 thin films by pulsed laser deposition on SrTiO3 (001) substrates under different oxygen partial pressures (PO2) . A close correlation between the structure (explored by XRD) and the magnetic properties (SQUID measurements) of the films with PO2 has been identified. At high PO2 FM behavior is observed. In contrast, at very low PO2, the results obtained for unit cell volume (close to stoichiometric bulk values) and magnetic moment (0.2 μB/Mn) strongly indicate antiferromagnetic ordering. We acknowledge financial support from the Spanish MINECO (MAT2012-33207).

  7. The interface analysis of GaN grown on 0° off 6H-SiC with an ultra-thin buffer layer

    NASA Astrophysics Data System (ADS)

    Sun, Zheng; Ohta, Akio; Miyazaki, Seiichi; Nagamatsu, Kentaro; Lee, Hojun; Olsson, Marc; Ye, Zheng; Deki, Manato; Honda, Yoshio; Amano, Hiroshi

    2016-01-01

    Previously, we reported a growth method by metalorganic vapor phase epitaxy using a single two-dimensional growth step, resulting in 1.2-µm crack-free GaN directly grown on 6H-SiC substrate. The introduction of Al-treatment prior to the standard GaN growth step resulted in improved surface wetting of gallium on the SiC substrate. Transmission electron microscope and energy dispersive spectrometer analysis of the epitaxial interface to the SiC determined that an ultra-thin AlGaN interlayer had formed measuring around 2-3 nm. We expect our growth technique can be applied to the fabrication of GaN/SiC high frequency and high power devices.

  8. Effect of post-growth rapid thermal annealing on bilayer InAs/GaAs quantum dot heterostructure grown with very thin spacer thickness

    SciTech Connect

    Sengupta, S.; Halder, N.; Chakrabarti, S.

    2010-11-15

    We have investigated the effect of post-growth rapid thermal annealing on self-assembled InAs/GaAs bilayer quantum dot samples having very thin barrier thickness (7.5-8.5 nm). In/Ga interdiffusion in the samples due to annealing is presumed to be controlled by the vertical strain coupling from the seed dots in bilayer heterostructure. Strain coupling from embedded seed QD layer maintains a strain relaxed state in active top islands of the bilayer quantum dot sample grown with comparatively thick spacer layer (8.5 nm). This results in minimum In/Ga interdiffusion. However controlled interdiffusion across the interface between dots and GaAs barrier, noticeably enhances the emission efficiency in such bilayer quantum dot heterostructure on annealing up to 700 {sup o}C.

  9. Spin-resolved photoemission study of epitaxially grown MoSe 2 and WSe 2 thin films

    SciTech Connect

    Mo, Sung-Kwan; Hwang, Choongyu; Zhang, Yi; Fanciulli, Mauro; Muff, Stefan; Hugo Dil, J.; Shen, Zhi-Xun; Hussain, Zahid

    2016-09-12

    Few-layer thick MoSe2 and WSe2 possess non-trivial spin textures with sizable spin splitting due to the inversion symmetry breaking embedded in the crystal structure and strong spin–orbit coupling. Here, we report a spin-resolved photoemission study of MoSe2 and WSe2 thin film samples epitaxially grown on a bilayer graphene substrate. Furthermore, we only found spin polarization in the single- and trilayer samples—not in the bilayer sample—mostly along the out-of-plane direction of the sample surface. The measured spin polarization is found to be strongly dependent on the light polarization as well as the measurement geometry, which reveals intricate coupling between the spin and orbital degrees of freedom in this class of material.

  10. Electron spin resonance of Zn{sub 1-x}Mg{sub x}O thin films grown by plasma-assisted molecular beam epitaxy

    SciTech Connect

    Wassner, T. A.; Stutzmann, M.; Brandt, M. S.; Laumer, B.; Althammer, M.; Goennenwein, S. T. B.; Eickhoff, M.

    2010-08-30

    Zn{sub 1-x}Mg{sub x}O thin films with a Mg content x between 0 and 0.42 grown by plasma-assisted molecular beam epitaxy on c-plane sapphire substrates were investigated by electron spin resonance at 5 K. Above band gap illumination induces a persistent resonance signal, which is attributed to free conduction band electrons. The g-factors of the Zn{sub 1-x}Mg{sub x}O epitaxial layers and their anisotropy were determined experimentally and an increase from g{sub ||}=1.957 for x=0 to g{sub ||}=1.970 for x=0.42 was found, accompanied by a decrease in anisotropy. A comparison with g-factors of the Al{sub x}Ga{sub 1-x}N system is also given.

  11. Synthesis of nanocrystalline Cu{sub 2}ZnSnS{sub 4} thin films grown by the spray-pyrolysis technique

    SciTech Connect

    Chandel, Tarun Singh, Joginder; Rajaram, P.

    2015-08-28

    Spray pyrolysis was used to deposit Cu{sub 2}ZnSnS{sub 4} (CZTS) thin films on soda lime glass substrates at 300 °C. Aqueous solutions of copper chloride, zinc chloride, stannous chloride and thiourea were mixed together to form the spray liquid. The sprayed films were annealed under vacuum at 350 °C, 400 °C and 450 °C. Structural and optical characterization was performed on the CZTS films using X-ray diffraction (XRD) and UV-VIS spectrophotometry. XRD results indicate that the films are single phase nanocrystalline CZTS. Optical studies show that the optical gap values are 1.44 eV for the as-grown film and 1.46 eV, 1.48 eV and 1.49 eV for the films annealed at 350 °C, 400 °C and 450 °C, respectively.

  12. REDUCED LEAKAGE CURRENT AND ENHANCED MAGNETIC PROPERTIES OF (Bi,Nd)FeO3 THIN FILMS GROWN ON (Ba,Sr)TiO3 BOTTOM LAYER

    NASA Astrophysics Data System (ADS)

    Ma, C. B.; Tang, X. G.; Chen, D. G.; Liu, Q. X.; Jiang, Y. P.; Xiong, D. P.; Zhou, Y. C.

    2012-09-01

    A multiferroic heterostructure composed of (Bi0.875Nd0.125)FeO3 (BNF) are grown on (Ba0.65Sr0.35)TiO3(BST) buffered Pt/Ti/SiO2/Si(100) substrate by rf-magnetron sputtering. The heterostructure BNF/BST exhibits a quite low leakage current (3.7 × 10-7 A/cm2 at 300 kV/cm) and dielectric loss (0.0036 at 100 kHz) at room temperature. The saturated magnetization and the coercive field of the BST/BNF heterostructure are 37.7 emu/cm3 and 357.6 Oe, respectively. The low leakage current owed to the action of BST in the charge transfer between BNF and the bottom electrode, the coupling reaction between BST and BNF films. And the better crystallization in BNF/BST heterostructure thin film lead to the ferromagnetic properties enhanced.

  13. Direct observation of fatigue in epitaxially grown Pb(Zr,Ti)O3 thin films using second harmonic piezoresponse force microscopy

    SciTech Connect

    Murari, Nishit M.; Hong, Seungbum; Lee, Ho Nyung; Katiyar, Ram S.

    2011-08-02

    In this study, we present a direct observation of fatigue phenomena in epitaxially grown Pb(Zr0.2Ti0.8)O3(PZT)thin films using second harmonic piezoresponse force microscopy (SH-PFM). We observed strong correlation between the SH-PFM amplitude and phase signals with the remnant piezoresponse at different switching cycles. The SH-PFM results indicate that the average fraction of switchable domains decreases globally and the phase delays of polarization switching differ locally. In addition, we found that the fatigue developed uniformly over the whole area without developing region-by-region suppression of switchable polarization as in polycrystalline PZTthin films.

  14. Spin waves with large decay length and few 100 nm wavelengths in thin yttrium iron garnet grown at the wafer scale

    NASA Astrophysics Data System (ADS)

    Maendl, Stefan; Stasinopoulos, Ioannis; Grundler, Dirk

    2017-07-01

    Using conventional coplanar waveguides (CPWs), we excited spin waves with a wavelength λ down to 310 nm in a 200 nm thin yttrium iron garnet film grown by liquid phase epitaxy. Spin-wave transmission was detected between CPWs that we separated by up to 2 mm. For magnetostatic surface spin waves, we found a large nonreciprocity of 0.9 and a high group velocity vg of up to 5.4 km/s. The extracted decay length ld amounted to 0.86 mm. Small λ, high vg , and large ld are key figures of merit when aiming at non-charged based signal transmission and logic devices with spin waves.

  15. Realization of compressively strained GaN films grown on Si(110) substrates by inserting a thin AlN/GaN superlattice interlayer

    SciTech Connect

    Shen, X. Q.; Takahashi, T.; Kawashima, H.; Ide, T.; Shimizu, M.

    2012-07-16

    We investigate the strain properties of GaN films grown by plasma-assisted molecular beam epitaxy on Si(110) substrates. It is found that the strain of the GaN film can be converted from a tensile to a compressive state simply by inserting a thin AlN/GaN superlattice structure (SLs) within the GaN film. The GaN layers seperated by the SLs can have different strain states, which indicates that the SLs plays a key role in the strain modulation during the growth and the cooling down processes. Using this simple technique, we grow a crack-free GaN film exceeding 2-{mu}m-thick. The realization of the compressively strained GaN film makes it possible to grow thick GaN films without crack generation on Si substrates for optic and electronic device applications.

  16. Magnetic and transport properties of epitaxial thin film MgFe2O4 grown on MgO (100) by molecular beam epitaxy.

    PubMed

    Wu, Han-Chun; Mauit, Ozhet; Coileáin, Cormac Ó; Syrlybekov, Askar; Khalid, Abbas; Mouti, Anas; Abid, Mourad; Zhang, Hong-Zhou; Abid, Mohamed; Shvets, Igor V

    2014-11-12

    Magnesium ferrite is a very important magnetic material due to its interesting magnetic and electrical properties and its chemical and thermal stability. Here we report on the magnetic and transport properties of epitaxial MgFe2O4 thin films grown on MgO (001) by molecular beam epitaxy. The structural properties and chemical composition of the MgFe2O4 films were characterized by X-Ray diffraction and X-Ray photoelectron spectroscopy, respectively. The nonsaturation of the magnetization in high magnetic fields observed for M (H) measurements and the linear negative magnetoresistance (MR) curves indicate the presence of anti-phase boundaries (APBs) in MgFe2O4. The presence of APBs was confirmed by transmission electron microscopy. Moreover, post annealing decreases the resistance and enhances the MR of the film, suggesting migration of the APBs. Our results may be valuable for the application of MgFe2O4 in spintronics.

  17. Domain formation due to surface steps in topological insulator Bi{sub 2}Te{sub 3} thin films grown on Si (111) by molecular beam epitaxy

    SciTech Connect

    Borisova, S.; Kampmeier, J.; Mussler, G.; Grützmacher, D.; Luysberg, M.

    2013-08-19

    The atomic structure of topological insulators Bi{sub 2}Te{sub 3} thin films on Si (111) substrates grown in van der Waals mode by molecular beam epitaxy has been investigated by in situ scanning tunneling microscopy and scanning transmission electron microscopy. Besides single and multiple quintuple layer (QL) steps, which are typical for the step-flow mode of growth, a number of 0.4 QL steps is observed. We determine that these steps originate from single steps at the substrate surface causing domain boundaries in the Bi{sub 2}Te{sub 3} film. Due to the peculiar structure of these domain boundaries the domains are stable and penetrate throughout the entire film.

  18. Spin-resolved photoemission study of epitaxially grown MoSe 2 and WSe 2 thin films

    SciTech Connect

    Mo, Sung-Kwan; Hwang, Choongyu; Zhang, Yi; Fanciulli, Mauro; Muff, Stefan; Hugo Dil, J.; Shen, Zhi-Xun; Hussain, Zahid

    2016-09-12

    Few-layer thick MoSe2 and WSe2 possess non-trivial spin textures with sizable spin splitting due to the inversion symmetry breaking embedded in the crystal structure and strong spin–orbit coupling. Here, we report a spin-resolved photoemission study of MoSe2 and WSe2 thin film samples epitaxially grown on a bilayer graphene substrate. Furthermore, we only found spin polarization in the single- and trilayer samples—not in the bilayer sample—mostly along the out-of-plane direction of the sample surface. The measured spin polarization is found to be strongly dependent on the light polarization as well as the measurement geometry, which reveals intricate coupling between the spin and orbital degrees of freedom in this class of material.

  19. Raman spectroscopic studies of Pb xLa 1- xTi 1- x/4 O 3 thin films grown on Si substrates by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Zhu, J. L.; Zhu, W. L.; Li, R. T.; Ge, W. Y.; Jiang, M.; Zhu, J. G.; Xiao, D. Q.; Pezzotti, G.

    2008-05-01

    A systematic spectroscopic investigation of Pb xLa 1- xTi 1- x/4 O 3 (PLT) thin films grown on PbO x/Pt/Ti/SiO 2/Si substrate by RF magnetron sputtering was performed by using confocal Raman spectroscopy. Influence of the growth condition modification including different growth temperatures, with various buffer layer thickness, and post-annealing treatments were analyzed with taking advantages of the corresponding Raman spectral band variation in the respective process. Significant change in the spectral bands occurred with the alteration of the growth condition, and the related mechanisms were discussed after spectral deconvolution, providing reliable information about the direction for film growth.

  20. Research of surface-oxidation epitaxy of NiO films on cube textured Ni tapes

    NASA Astrophysics Data System (ADS)

    Shi, D. Q.; Ionescu, M.; McKinnon, J.; Chen, W. M.; Dou, S. X.

    2002-05-01

    Thin films of NiO were fabricated in air by surface-oxidation epitaxy (SOE) on biaxially-textured Ni substrate, for use as buffer layers for YBCO coated conductors. The surface-oxidation conditions such as the temperature and the reaction time, as well as the cooling rate, play a determining role in the process of epitaxial growth of the NiO layer. A continuous, biaxially-aligned textured NiO layer, was obtained for a 10 min oxidation in air at 1120 °C, and a cooling rate of 150 K/h. The roughness of the NiO layer is mostly controlled by a coarsening of some NiO grains.

  1. Sulfurization effect on optical properties of Cu2SNS3 thin films grown by two-stage process

    NASA Astrophysics Data System (ADS)

    Reddy, G. Phaneendra; Reddy, K. T. Ramakrishna

    2017-05-01

    A good phase controlled and impurity free two stage process was used to prepare Cu2SnS3 layers on glass substrates. The layers were prepared by sulfurization of sputtered Cu-Sn metallic precursors by varying the sulfurization temperature (Ts) in the range, 150-450°C, keeping the other deposition parameters constant. A complete investigation of the optical properties of the layers with sulfurization temperature was made by using the optical transmittance and reflectance measurements versus wavelength. The absorption coefficient α, was evaluated using the optical data that showed a α > 104 cm-1 for all the as-grown films. The optical bandgap of the as grown layers was determined from the second derivative diffused reflectance spectra that varied from 1.96 eV to 0.99 eV. Consequently, refractive index and extinction coefficient were calculated from Pankov's relations. In addition, the other optical parameters such as the dielectric constants, dissipation factor and also optical conductivity calculated. A detailed analysis of the dependence of all the above parameters on Ts is reported and discussed.

  2. Structural, morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

    NASA Astrophysics Data System (ADS)

    Siddiqui, Jamil; Hussain, Tousif; Ahmad, Riaz; Umar, Zeeshan A.; Abdus Samad, Ubair

    2016-05-01

    The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10 cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10 cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4 ± 0.4 GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10 cm axial distance with 15 PFS.

  3. Photoreflectance analysis of annealed vanadium-doped GaAs thin films grown by metalorganic vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Fitouri, H.; Bilel, C.; Zaied, I.; Bchetnia, A.; Rebey, A.; El Jani, B.

    2015-09-01

    In this study, we investigate the optical properties of annealed vanadium-doped GaAs films grown on GaAs substrates by metalorganic vapor phase epitaxy. The temperature dependence of the photoreflectance (PR) of as-grown GaAs:V films has been studied. We used the fit with Third-Derivative Functional Form model to evaluate the physical parameters. The temperature dependence of band gap and spin-orbit energies can be described by the Bose-Einstein statistical expression. The PR spectra of the samples are measured after thermal annealing in order to check any improvement in the optical quality of the material. The PR signal amplitude of GaAs:V samples decreased after thermal annealing. Degradation of the PR signal for annealing temperature at about 850 °C is observed revealing a poor quality of the layer surface states and an important density of the recombination centers. The lock-in phase analysis of PR spectra allows to determine the time constant for GaAs:V sample before and after thermal annealing.

  4. Influence of La and Mn vacancies on the electronic and magnetic properties of LaMnO3 thin films grown by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Marozau, Ivan; Das, Proloy T.; Döbeli, Max; Storey, James G.; Uribe-Laverde, Miguel A.; Das, Saikat; Wang, Chennan; Rössle, Matthias; Bernhard, Christian

    2014-05-01

    With pulsed laser deposition, we have grown c axis oriented thin films of the nominal composition LaMnO3 (LMO) on LSAT(001) substrates. We find that, depending on the oxygen background pressure during growth, the LMO films contain sizeable amounts of La and/or Mn vacancies that strongly influence their electronic and magnetic properties. Specifically, we show that the Mn/La ratio can be systematically varied from 0.92 at 0.11 mbar to 1.09 at 0.30 mbar of oxygen. The cationic vacancies have markedly different effects that become most pronounced once the samples are fully oxygenated and thus strongly hole doped. All as-grown and thus slightly oxygen-deficient LMO films are ferromagnetic insulators with saturation moments in excess of 2.5 μB per Mn ion, their transport and optical properties can be understood in terms of trapped ferromagnetic polarons. Upon oxygen annealing, the most La-deficient films develop a metallic response with an even larger ferromagnetic saturation moment of 3.8 μB per Mn ion. In contrast, in the oxygenated Mn-deficient films, the ferromagnetic order is strongly suppressed to less than 0.5 μB per Mn ion, and the transport remains insulatorlike. We compare our results with the ones that were previously obtained on bulk samples and present an interpretation in terms of the much stronger disruption of the electronic and magnetic structure by the Mn vacancies as compared to the La vacancies. We also discuss the implications for the growth of LMO thin films with well-defined physical properties that are a prerequisite for the study of interface effects in multilayers.

  5. IR emission and electrical conductivity of Nd/Nb-codoped TiOx (1.5 < x < 2) thin films grown by pulsed-laser deposition

    NASA Astrophysics Data System (ADS)

    Tchiffo-Tameko, C.; Cachoncinlle, C.; Perriere, J.; Nistor, M.; Petit, A.; Aubry, O.; Pérez Casero, R.; Millon, E.

    2016-12-01

    The effect of the co-doping with Nd and Nb on electrical and optical properties of TiOx films is reported. The role of oxygen vacancies on the physical properties is also evidenced. The films are grown by pulsed-laser deposition onto (001) sapphire and (100) silicon substrates. The substrate temperature was fixed at 700 °C. To obtain either stoichiometric (TiO2) or highly oxygen deficient (TiOx with x < 1.6) thin films, the oxygen partial pressure was adjusted at 10-1 and 10-6 mbar, respectively. 1%Nd-1%Nb, 1%Nd-5%Nb and 5%Nd-1%Nb co-doped TiO2 were used as bulk ceramic target. Composition, structural and morphological properties of films determined by Rutherford backscattering spectroscopy, X-ray diffraction and scanning electron microscopy, are correlated to their optical (UV-vis transmission and photoluminescence) and electrical properties (resistivity at room temperature). The most intense Nd3+ emission in the IR domain is obtained for stoichiometric films. Codoping Nd-TiOx films by Nb5+ ions is found to decrease the photoluminescence efficiency. The oxygen pressure during the growth allows to tune the optical and electrical properties: insulating and highly transparent (80% in the visible range) Nd/Nb codoped TiO2 films are obtained at high oxygen pressure, while conductive and absorbent films are grown under low oxygen pressure (10-6 mbar).

  6. Structural properties of Bi2Te3 topological insulator thin films grown by molecular beam epitaxy on (111) BaF2 substrates

    NASA Astrophysics Data System (ADS)

    Fornari, Celso I.; Rappl, Paulo H. O.; Morelhão, Sérgio L.; Abramof, Eduardo

    2016-04-01

    Structural properties of topological insulator bismuth telluride films grown epitaxially on (111) BaF2 with a fixed Bi2Te3 beam flux were systematically investigated as a function of substrate temperature and additional Te flux. A layer-by-layer growth mode is observed since the early stages of epitaxy and remains throughout the whole deposition. Composition of the epitaxial films produced here stays between Bi2Te3 and Bi4Te5, as determined from the comparison of the measured x-ray diffraction curves with calculations. The substrate temperature region, where the growth rate remains constant, is found to be the most appropriate to obtain ordered Bi2Te3 films. Line width of the L = 18 Bi2Te3 diffraction peaks as low as 140 arcsec was obtained, indicating high crystalline quality. Twinning domains density rises with increasing growth temperature and reducing Te extra flux. X-ray reflectivity curves of pure Bi2Te3 films with thickness from 165 to 8 nm exhibited well defined interference fringes, evidencing homogeneous layers with smooth surface. Our results demonstrate that Bi2Te3 films with very well controlled structural parameters can be obtained. High structural quality Bi2Te3 films as thin as only eight quintuple layers grown here are promising candidates for intrinsic topological insulator.

  7. Incorporation of La in epitaxial SrTiO3 thin films grown by atomic layer deposition on SrTiO3-buffered Si (001) substrates

    NASA Astrophysics Data System (ADS)

    McDaniel, Martin D.; Posadas, Agham; Ngo, Thong Q.; Karako, Christine M.; Bruley, John; Frank, Martin M.; Narayanan, Vijay; Demkov, Alexander A.; Ekerdt, John G.

    2014-06-01

    Strontium titanate, SrTiO3 (STO), thin films incorporated with lanthanum are grown on Si (001) substrates at a thickness range of 5-25 nm. Atomic layer deposition (ALD) is used to grow the LaxSr1-xTiO3 (La:STO) films after buffering the Si (001) substrate with four-unit-cells of STO deposited by molecular beam epitaxy. The crystalline structure and orientation of the La:STO films are confirmed via reflection high-energy electron diffraction, X-ray diffraction, and cross-sectional transmission electron microscopy. The low temperature ALD growth (˜225 °C) and post-deposition annealing at 550 °C for 5 min maintains an abrupt interface between Si (001) and the crystalline oxide. Higher annealing temperatures (650 °C) show more complete La activation with film resistivities of ˜2.0 × 10-2 Ω cm for 20-nm-thick La:STO (x ˜ 0.15); however, the STO-Si interface is slightly degraded due to the increased annealing temperature. To demonstrate the selective incorporation of lanthanum by ALD, a layered heterostructure is grown with an undoped STO layer sandwiched between two conductive La:STO layers. Based on this work, an epitaxial oxide stack centered on La:STO and BaTiO3 integrated with Si is envisioned as a material candidate for a ferroelectric field-effect transistor.

  8. Characteristics of quenched Y-Ba-Cu-O thin films on SrTiO/sub 3/ (100),(110) grown by organometallic chemical vapor deposition

    SciTech Connect

    Tsuruoka, T.; Takahashi, H.; Kawasaki, R.; Kanamori, T.

    1989-05-01

    A thin Y-Ba-Cu-O film was formed by the organometallic chemical vapor deposition (OMCVD) method. The substrates used were (100) and (110) SrTiO/sub 3/. After forming Y-Ba-Cu-O at 800 /sup 0/C, it was cooled at a rate of 100 /sup 0/C/min in O/sub 2/ under 1 atm. This film was c-axis oriented, with its (001) surface grown in parallel to the (100) surface of SrTiO/sub 3/ and T/sub c/ = 88 K. The (110) surface of Y-Ba-Cu-O was grown in parallel to the substrate crystal and T/sub c/ = 84 K on the (110) surface of SrTiO/sub 3/. After forming, these films were quenched in air from 800 /sup 0/C to room temperature. The change in resistance of the quenched sample with temperature was metallic, T/sub onset/ = 75 K, and T/sub c/ = 60 K.

  9. Thermal stability and relaxation mechanisms in compressively strained Ge{sub 0.94}Sn{sub 0.06} thin films grown by molecular beam epitaxy

    SciTech Connect

    Fleischmann, C.; Lieten, R. R.; Shimura, Y.; Vandervorst, W.; Hermann, P.; Hönicke, P.; Beckhoff, B.; Seidel, F.; Richard, O.; Bender, H.; Zaima, S.; Uchida, N.; Temst, K.; Vantomme, A.

    2016-08-28

    Strained Ge{sub 1-x}Sn{sub x} thin films have recently attracted a lot of attention as promising high mobility or light emitting materials for future micro- and optoelectronic devices. While they can be grown nowadays with high crystal quality, the mechanism by which strain energy is relieved upon thermal treatments remains speculative. To this end, we investigated the evolution (and the interplay) of composition, strain, and morphology of strained Ge{sub 0.94}Sn{sub 0.06} films with temperature. We observed a diffusion-driven formation of Sn-enriched islands (and their self-organization) as well as surface depressions (pits), resulting in phase separation and (local) reduction in strain energy, respectively. Remarkably, these compositional and morphological instabilities were found to be the dominating mechanisms to relieve energy, implying that the relaxation via misfit generation and propagation is not intrinsic to compressively strained Ge{sub 0.94}Sn{sub 0.06} films grown by molecular beam epitaxy.

  10. Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using HfO2 ceramic target

    SciTech Connect

    Aguirre, B.; Vemuri, R. S.; Zubia, David; Engelhard, Mark H.; Shutthanandan, V.; Kamala Bharathi, K.; Ramana, Chintalapalle V.

    2011-01-01

    Hafnium oxide (HfO₂) thin films have been made by radio-frequency (rf) magnetron-sputtering onto Si(100) substrates under varying growth temperature (Ts). HfO₂ ceramic target has been employed for sputtering while varying the Ts from room temperature to 500⁰C during deposition. The effect of Ts on the growth and microstructure of deposited HfO₂ films has been studied using grazing incidence x-ray diffraction (GIXRD), X-ray photoelectron spectroscopy (XPS), and high-resolution scanning electron microscopy (HR-SEM) coupled with energy dispersive x-ray spectrometry (EDS). The results indicate that the effect of Ts is significant on the growth, surface and interface structure, morphology and chemical composition of the HfO₂ films. Structural characterization indicates that the HfO₂ films grown at Ts<200 ⁰C are amorphous while films grown at Ts>200 ⁰C are nanocrystalline. An amorphous-to-crystalline transition occurs at Ts=200 ⁰C. Nanocrystalline HfO₂ films crystallized in a monoclinic structure with a (-111) orientation. XPS measurements indicated the high surface-chemical quality and stoichiometric nature of the grown HfO₂ films. An interface layer (IL) formation occurs due to reaction at the HfO₂-Si interface for HfO₂ films deposited at Ts>200 ⁰C. The thickness of IL increases with increasing Ts. XPS and EDS at the HfO₂-Si cross-section indicate the IL is a (Hf, Si)-O compound. The electrical characterization using capacitance-voltage measurements indicate that the dielectric constant decreases from 25 to 16 with increasing Ts.

  11. Structural, optical, and conducting properties of crystalline ZnO:Co thin films grown by reactive electron beam deposition

    NASA Astrophysics Data System (ADS)

    Gürbüz, Osman; Güner, Sadık; Büyükbakkal, Ömer; Çalışkan, Serkan

    2015-01-01

    We deposited an undoped ZnO and 6 different Co doped ZnO (ZnO:Co) thin films on fused silica (SiO2) substrates with ~100 nm thickness at substrate temperature of 125 °C using a Reactive Electron Beam Deposition technique. Energy-Dispersive X-ray Spectroscopy (EDS) was used to analyze the elemental composition rates of films. Elemental Co concentration varies from 4.62 to 28.77 at. %. The surface morphologies and grain sizes of thin films were investigated by Scanning Electron Microscope (SEM). The crystal and phase structures of the ZnO:Co thin films were characterized using X-ray diffraction (XRD). The films have single crystal and polycrystalline structures due to Co concentrations. Theoretical crystallite size and strain calculations were performed by applying the Scherrer and Williamson-Hall (W-H) methods. The grain sizes are 2-4 times greater than the crystalline sizes for ZnO:Co films. Optical properties of the films were studied by absorbance measurements using a UV-vis spectrophotometer. The analysis of the optical absorption spectra indicated that the energy band gap of the bulk ZnO film increased from 3.22 eV to maximum 4.17 eV upon Co deposition. Co2+ ion replaces Zn2+ ion in the structure without causing any remarkable defect for its hexagonal Wurtzite structure. Electrical conducting properties were investigated by using a Four Point Probe (FPP) technique. The conductivity depends on crystalline quality and Co concentration.

  12. Atomic layer deposition grown MO{sub x} thin films for solar water splitting: Prospects and challenges

    SciTech Connect

    Singh, Trilok; Lehnen, Thomas; Leuning, Tessa; Mathur, Sanjay

    2015-01-15

    The magnitude of energy challenge not only calls for efficient devices but also for abundant, inexpensive, and stable photoactive materials that can enable efficient light harvesting, charge separation and collection, as well as chemical transformations. Photoelectrochemical systems based on semiconductor materials have the possibility to transform solar energy directly into chemical energy the so-called “solar hydrogen.” The current challenge lies in the harvesting of a larger fraction of electromagnetic spectrum by enhancing the absorbance of electrode materials. In this context, atomically precise thin films of metal oxide semiconductors and their multilayered junctions are promising candidates to integrate high surface areas with well-defined electrode–substrate interface. Given its self-limited growth mechanism, the atomic layer deposition (ALD) technique offers a wide range of capabilities to deposit and modify materials at the nanoscale. In addition, it opens new frontiers for developing precursor chemistry that is inevitable to design new processes. Herein, the authors review the properties and potential of metal oxide thin films deposited by ALD for their application in photoelectrochemical water splitting application. The first part of the review covers the basics of ALD processes followed by a brief discussion on the electrochemistry of water splitting reaction. The second part focuses on different MO{sub x} films deposited by atomic layer deposition for water splitting applications; in this section, The authors discuss the most explored MO{sub x} semiconductors, namely, Fe{sub 2}O{sub 3}, TiO{sub 2}, WO{sub 3}, and ZnO, as active materials and refer to their application as protective coatings, conductive scaffolds, or in heterojunctions. The third part deals with the current challenges and future prospects of ALD processed MO{sub x} thin films for water splitting reactions.

  13. Structural characterization of metastable hcp-Ni thin films epitaxially grown on Au(100) single-crystal underlayers

    SciTech Connect

    Ohtake, Mitsuru; Tanaka, Takahiro; Futamoto, Masaaki; Kirino, Fumiyoshi

    2010-05-15

    Ni(1120) epitaxial thin films with hcp structure were prepared on Au(100) single-crystal underlayers at 100 deg. C by ultra high vacuum molecular beam epitaxy. The detailed film structure is studied by in situ reflection high energy electron diffraction, x-ray diffraction, and transmission electron microscopy. The hcp-Ni film consists of two types of variants whose c-axes are rotated around the film normal by 90 deg. each other. An atomically sharp boundary is recognized between the film and the underlayer, where misfit dislocations are introduced. Presence of such dislocations seems to relieve the strain caused by the lattice mismatch between the film and the underlayer.

  14. AnGa{sub 2}O{sub 4} Thin-Film Phosphors Grown by Pulsed Laser Ablation

    SciTech Connect

    Lee, Y.E.; Rouleau, C.M.; Park, C.; Norton, D.P.

    1999-04-05

    The growth and properties of undoped and Mn-doped ZnGa{sub 2}O{sub 4} thin-film phosphors on (100) MgO and glass substrates using pulsed laser ablation were investigated. Blue-white and green emission were observed for as-deposited undoped and Mn-doped films, respectively. Luminescent properties as well as crystallinity were considerably affected by processing conditions and film stoichiometry. Films with enhanced luminescent characteristics were obtained on single crystal substrates without post-annealing.

  15. AlN thin films grown on epitaxial 3C-SiC (100) for piezoelectric resonant devices

    SciTech Connect

    Lin, Chih-Ming; Senesky, Debbie G.; Pisano, Albert P.; Lien, Wei-Cheng; Felmetsger, Valery V.; Hopcroft, Matthew A.

    2010-10-04

    Highly c-axis oriented heteroepitaxial aluminum nitride (AlN) films were grown on epitaxial cubic silicon carbide (3C-SiC) layers on Si (100) substrates using alternating current reactive magnetron sputtering at temperatures between approximately 300-450 deg. C. The AlN films were characterized by x-ray diffraction, scanning electron microscope, and transmission electron microscopy. A two-port surface acoustic wave device was fabricated on the AlN/3C-SiC/Si composite structure, and an expected Rayleigh mode exhibited a high acoustic velocity of 5200 m/s. The results demonstrate the potential of utilizing AlN films on epitaxial 3C-SiC layers to create piezoelectric resonant devices.

  16. Reversible Change in Electrical and Optical Properties in Epitaxially Grown Al-Doped ZnO Thin Films

    SciTech Connect

    Noh, J. H.; Jung, H. S.; Lee, J. K.; Kim, J. Y; Cho, C. M.; An, J.; Hong, K. S.

    2008-01-01

    Aluminum-doped ZnO (AZO) films were epitaxially grown on sapphire (0001) substrates using pulsed laser deposition. As-deposited AZO films had a low resistivity of 8.01 x 10{sup -4} {Omega} cm. However, after annealing at 450 C in air, the electrical resistivity of the AZO films increased to 1.97 x 10{sup -1} {Omega} cm because of a decrease in the carrier concentration. Subsequent annealing of the air-annealed AZO films in H{sub 2} recovered the electrical conductivity of the AZO films. In addition, the conductivity change was reversible upon repeated air and H{sub 2} annealing. A photoluminescence study showed that oxygen interstitial (O{sub i}) is a critical material parameter allowing for the reversible control of the electrical conducting properties of AZO films.

  17. Effects of O2 plasma post-treatment on ZnO: Ga thin films grown by H2O-thermal ALD

    NASA Astrophysics Data System (ADS)

    Lee, Yueh-Lin; Chuang, Jia-Hao; Huang, Tzu-Hsuan; Ho, Chong-Long; Wu, Meng-Chyi

    2013-03-01

    Transparent conducting oxides have been widely employed in optoelectronic devices using the various deposition methods such as sputtering, thermal evaporator, and e-gun evaporator technologies.1-3 In this work, gallium doped zinc oxide (ZnO:Ga) thin films were grown on glass substrates via H2O-thermal atomic layer deposition (ALD) at different deposition temperatures. ALD-GZO thin films were constituted as a layer-by-layer structure by stacking zinc oxides and gallium oxides. Diethylzinc (DEZ), triethylgallium (TEG) and H2O were used as zinc, gallium precursors and oxygen source, respectively. Furthermore, we investigated the influences of O2 plasma post-treatment power on the surface morphology, electrical and optical property of ZnO:Ga films. As the result of O2 plasma post-treatment, the characteristics of ZnO:Ga films exhibit a smooth surface, low resistivity, high carrier concentration, and high optical transmittance in the visible spectrum. However, the transmittance decreases with O2 plasma power in the near- and mid-infrared regions.

  18. XPS analysis and structural and morphological characterization of Cu2ZnSnS4 thin films grown by sequential evaporation

    NASA Astrophysics Data System (ADS)

    Gordillo, G.; Calderón, C.; Bartolo-Pérez, P.

    2014-06-01

    This work describes a procedure to grow single phase Cu2ZnSnS4 (CZTS) thin films with tetragonal-kesterite type structure, through sequential evaporation of the elemental metallic precursors under sulphur vapor supplied from an effusion cell. X-ray diffraction analysis (XRD) is mostly used for phase identification but cannot clearly distinguish the formation of secondary phases such as Cu2SnS3 (CTS) because both compounds have the same diffraction pattern; therefore the use of a complementary technique is needed. Raman scattering analysis was used to distinguish these phases. The influence of the preparation conditions on the morphology and phases present in CZTS thin films were investigated through measurements of scanning electron microscopy (SEM) and XRD, respectively. From transmittance measurements, the energy band gap of the CZTS films was estimated to be around 1.45 eV. The limitation of XRD to identify some of the remaining phases after the growth process are investigated and the results of Raman analysis on the phases formed in samples grown by this method are presented. Further, the influence of the preparation conditions on the homogeneity of the chemical composition in the volume was studied by X-ray photoelectron spectroscopy (XPS) analysis.

  19. Tuning of near-infrared luminescence of SrTiO3:Ni2+ thin films grown on piezoelectric PMN-PT via strain engineering.

    PubMed

    Bai, Gongxun; Zhang, Yang; Hao, Jianhua

    2014-07-17

    We report the tunable near-infrared luminescence of Ni(2+) doped SrTiO3 (STO:Ni) thin film grown on piezoelectric Pb(Mg(1/3)Nb(2/3))(0.7)Ti(0.3)O3 (PMN-PT) substrate via strain engineering differing from conventional chemical approach. Through controlling the thickness of STO:Ni film, the luminescent properties of the films including emission wavelength and bandwidth, as well as lifetime can be effectively tuned. The observed phenomena can be explained by the variation in the crystal field around Ni(2+) ions caused by strain due to the lattice mismatch. Moreover, the modulation of strain can be controlled under an external electric field via converse piezoelectric effect of PMN-PT used in this work. Consequently, controllable emission of the STO:Ni thin film is demonstrated in a reversible and real-time way, arising from the biaxial strain produced by piezoelectric PMN-PT. Physical mechanism behind the observation is discussed. This work will open a door for not only investigating the luminescent properties of the phosphors via piezoelectric platform, but also potentially developing novel planar light sources.

  20. Tuning of near-infrared luminescence of SrTiO3:Ni2+ thin films grown on piezoelectric PMN-PT via strain engineering

    PubMed Central

    Bai, Gongxun; Zhang, Yang; Hao, Jianhua

    2014-01-01

    We report the tunable near-infrared luminescence of Ni2+ doped SrTiO3 (STO:Ni) thin film grown on piezoelectric Pb(Mg1/3Nb2/3)0.7Ti0.3O3 (PMN-PT) substrate via strain engineering differing from conventional chemical approach. Through controlling the thickness of STO:Ni film, the luminescent properties of the films including emission wavelength and bandwidth, as well as lifetime can be effectively tuned. The observed phenomena can be explained by the variation in the crystal field around Ni2+ ions caused by strain due to the lattice mismatch. Moreover, the modulation of strain can be controlled under an external electric field via converse piezoelectric effect of PMN-PT used in this work. Consequently, controllable emission of the STO:Ni thin film is demonstrated in a reversible and real-time way, arising from the biaxial strain produced by piezoelectric PMN-PT. Physical mechanism behind the observation is discussed. This work will open a door for not only investigating the luminescent properties of the phosphors via piezoelectric platform, but also potentially developing novel planar light sources. PMID:25030046

  1. CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES: Structural and Electrical Properties of Single Crystalline Ga-Doped ZnO Thin Films Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Lu, Zhong-Lin; Zou, Wen-Qin; Xu, Ming-Xiang; Zhang, Feng-Ming; Du, You-Wei

    2009-11-01

    High-quality Ga-doped ZnO (ZnO:Ga) single crystalline films with various Ga concentrations are grown on a-plane sapphire substrates using molecular-beam epitaxy. The site configuration of doped Ga atoms is studied by means of x-ray absorption spectroscopy. It is found that nearly all Ga can substitute into ZnO lattice as electrically active donors, a generating high density of free carriers with about one electron per Ga dopant when the Ga concentration is no more than 2%. However, further increasing the Ga doping concentration leads to a decrease of the conductivity due to partial segregation of Ga atoms to the minor phase of the spinel ZnGa2O4 or other intermediate phase. It seems that the maximum solubility of Ga in the ZnO single crystalline film is about 2 at.% and the lowest resistivity can reach 1.92 × 10-4 Ω·cm at room temperature, close to the best value reported. In contrast to ZnO:Ga thin film with 1% or 2% Ga doping, the film with 4% Ga doping exhibits a metal semiconductor transition at 80 K. The scattering mechanism of conducting electrons in single crystalline ZnO:Ga thin film is discussed.

  2. Far-infrared transmission in GaN, AlN, and AlGaN thin films grown by molecular beam epitaxy

    SciTech Connect

    Ibanez, J.; Hernandez, S.; Alarcon-Llado, E.; Cusco, R.; Artus, L.; Novikov, S. V.; Foxon, C. T.; Calleja, E.

    2008-08-01

    We present a far-infrared transmission study on group-III nitride thin films. Cubic GaN and AlN layers and c-oriented wurtzite GaN, AlN, and Al{sub x}Ga{sub 1-x}N (x<0.3) layers were grown by molecular beam epitaxy on GaAs and Si(111) substrates, respectively. The Berreman effect allows us to observe simultaneously the transverse optic and the longitudinal optic phonons of both the cubic and the hexagonal films as transmission minima in the infrared spectra acquired with obliquely incident radiation. We discuss our results in terms of the relevant electromagnetic theory of infrared transmission in cubic and wurtzite thin films. We compare the infrared results with visible Raman-scattering measurements. In the case of films with low scattering volumes and/or low Raman efficiencies and also when the Raman signal of the substrate material obscures the weaker peaks from the nitride films, we find that the Berreman technique is particularly useful to complement Raman spectroscopy.

  3. Characterization of amorphous SIC:H thin films grown by RF plasma enhanced CVD on annealing temperature

    NASA Astrophysics Data System (ADS)

    Park, M. G.; Choi, W. S.; Boo, J.-H.; Kim, Y. T.; Yoon, D. H.; Hong, B.

    2002-06-01

    n this work, we investigated the dependence of optical and electrical properties of hydrogenated amorphous silicon carbide (a-SiCa:H) films on annealing temperature (T_a) and radio frquency (RF) power. The substrate temperature (T_s was 250 °C, the RF power was varied from 30 W to 400 W, and the range of T_s, was from 400 °C to 600 °C. The a-SiC:H films were deposited by using PECVD (plasma enhanced chemical vapor deposition) system on Coming glass and p-type Si (100) wafer with a SiH4+CH4 gas tnudiue. The experimental results have shown that the optical band gap energy (E_g) of the aSiC:H thin films changed little with the annealing temperature while Eg increased with the RF power. The Raman spectnrn of the thin films annealed at high temperatures showed that graphitization of carbon clusters and rnicrocrystalline silicon occurs. The current voltage characteristics have shown good electrical properties in relation to the annealed films.

  4. Bandgap tuning and spectroscopy analysis of In x Ga (1-x) N thin films grown by RF sputtering method

    NASA Astrophysics Data System (ADS)

    Jakkala, Pratheesh; Kordesch, Martin E.

    2017-01-01

    In this study, we present a simple and novel method for optical bandgap tuning of indium gallium nitride (InGaN) thin films by controlling the growth conditions in magnetron RF sputtering. Thin films with different indium (In) atomic compositions, x = 0.02 to 0.57 are deposited on high temperature aluminosilicate glass and silicon (111) substrates. Substrate temperature is varied from 35 °C to 450 °C. The gas mixture for sputtering is inert argon (Ar) and reactive nitrogen (N2). Total pressure of sputtering gas mixture is kept constant at 12 mTorr but partial pressures of Ar and N2 are varied. Ar partial pressure to total pressure ratio is varied from 0 to 0.75. Optical bandgap values from 1.4 eV to 3.15 eV, absorption coefficient values of ˜104 cm-1 to ˜7 × 105 cm-1 and critical film thickness values of 0.04 μm to 4 μm are measured. UV-visible spectroscopy method and Tauc plots are used. Bandgap tuning with Ar partial pressure ratio and substrate temperature is presented.

  5. Anisotropic spin structure along the easy axis of magnetization in epitaxially grown MnAs/GaAs(100) thin films

    SciTech Connect

    Song, J. H.; Cui, Y.; Lee, J. J.; Ketterson, J. B.

    2014-05-07

    We grew epitaxial MnAs thin films on GaAs(100) substrates using molecular-beam epitaxy and investigated their magnetic properties. The crystal orientation of the film was type-B. Measurements of the film's magnetization revealed two-fold symmetric magnetic anisotropy on its surface, with the easy and hard directions of magnetization along GaAs[1{sup ¯}10](MnAs[1{sup ¯}1{sup ¯}20]) and GaAs[110](MnAs[11{sup ¯}02]), respectively. We found breakage of the uniaxial anisotropy in magnetization along the easy direction of magnetization for both the magnetization versus magnetic field and magnetization versus temperature measurements. We suggest that the origin of this peculiar pinned ferromagnetism in the MnAs layer is the spin-exchange interaction between the MnAs film and the ultra-thin Mn layer formed at the interface of MnAs film and GaAs(100) substrate.

  6. Characterization of two different orientations of epitaxial niobium thin films grown on MgO(001) surfaces

    SciTech Connect

    Beringer, D. B.; Lukaszew, R. A.; Roach, W. M.; Clavero, C.; Reece, C. E.

    2013-12-14

    Epitaxial Nb thin films deposited onto the same crystalline insulating surface can evolve in very different fashions depending on specific deposition conditions, thereby affecting their microstructure, surface morphology and superconducting properties. Here, we examine and compare the microstructure and ensuing surface morphology from two distinct Nb/MgO series each with its own epitaxial registry—namely Nb(001)/MgO(001) and Nb(110)/MgO(001)—leading to distinct surface anisotropy and we closely examine the dynamical scaling of the surface features during growth. We compare our findings with those in other metal/MgO epitaxial systems and for the first time, general scaling formalism is applied to analyze anisotropic surfaces exhibiting biaxial symmetry. Further, Power Spectral Density is applied to the specific problem of thin film growth and surface evolution to qualify the set of deposition conditions leading to smoother surfaces. We find good correlation between the surface morphology and microstructure of the various Nb films with superconducting properties such as their residual resistance ratio and lower critical field.

  7. Characterization of two different orientations of epitaxial niobium thin films grown on MgO(001) surfaces

    SciTech Connect

    Beringer, Douglas B.; Roach, William M.; Clavero Perez, Cesar; Reece, Charles E.; Lukaszew, Rosa

    2013-12-01

    Epitaxial Nb thin films deposited onto the same crystalline insulating surface can evolve in very different fashions depending on specific deposition conditions, thereby affecting their microstructure, surface morphology and superconducting properties. Here, we examine and compare the microstructure and ensuing surface morphology from two distinct Nb/MgO series each with its own epitaxial registry?namely Nb(001)/MgO(001) and Nb(110)/MgO(001)?leading to distinct surface anisotropy and we closely examine the dynamical scaling of the surface features during growth. We compare our findings with those in other metal/MgO epitaxial systems and for the first time, general scaling formalism is applied to analyze anisotropic surfaces exhibiting biaxial symmetry. Further, Power Spectral Density is applied to the specific problem of thin film growth and surface evolution to qualify the set of deposition conditions leading to smoother surfaces. We find good correlation between the surface morphology and microstructure of the various Nb films with superconducting properties such as their residual resistance ratio and lower critical field.

  8. Tailoring Energy Bandgap of Al Doped ZnO Thin Films Grown by Vacuum Thermal Evaporation Method.

    PubMed

    Vyas, Sumit; Singh, Shaivalini; Chakrabarti, P

    2015-12-01

    The paper presents the results of our experimental investigation pertaining to tailoring of energy bandgap and other associated characteristics of undoped and Al doped ZnO (AZO) thin film by varying the atomic concentration of Al in ZnO. Thin films of ZnO and ZnO doped with Al (1, 3, and 5 atomic percent (at.%)) were deposited on silicon substrate for structural characterization and on glass substrate for optical characterization. The dependence of structural and optical properties of Al doped ZnO on the atomic concentration of Al added to ZnO has been reported. On the basis of the experimental results an empirical formula has been proposed to calculate the energy bandgap of AZO theoretically in the range of 1 to 5 at.% of Al. The study revealed that AZO films are composed of smaller and larger number of grains as compared to pure ZnO counterpart and density of the grains was found to increase as the Al concentration increased (from 1 to 5 at.%). The transmittance in the visible region was greater than 90% and found to increase with increasing Al concentration up to 5 at.%. The optical bandgap was found to increase initially with increase in atomic concentration of Al concentration up to 3 at.% and decrease thereafter with increasing concentration of Al.

  9. Effect of substrate temperature on structure and luminescence properties of YVO4:Eu3+ thin films grown by PLD

    NASA Astrophysics Data System (ADS)

    Foka, K. E.; Dejene, B. F.; Swart, H. C.

    2016-03-01

    YVO4:Eu3+ thin films were deposited by pulse laser deposition at substrate temperatures of 200, 300 and 400 °C. The oxygen deposition background pressure was also changed from 20 to 85 mTorr at a substrate temperature of 400 °C. The films deposited at the higher temperatures showed a tetragonal phase in consistent with the standard JCPDS card 17-0341. The X-ray diffraction patterns obtained from the 200 °C sample showed only a very small peak at the (200) orientation. The other phosphor thin film showed an improved crystalline structure when the temperature was increased. Scanning electron microscope images indicated larger particles on the surface at the higher temperatures. Atomic force microscopy results showed smooth surfaces with small particles at lower temperatures and an increase in surface roughness at higher temperatures due to the improvement in crystallinity. The photoluminescence showed the typical emission peaks of Eu3+ in the red region at 594 and 618 nm attributed to the 5D0-7F1 and 5D0-7F2 transitions. The peaks at 652 and 699 nm corresponding to the 5D0-7F3 and 5D0-7F4 transitions were also observed. The spectra showed an increase in PL intensity when the deposition temperature and oxygen pressure were increased.

  10. Influence of different aspect ratios on the structural and electrical properties of GaN thin films grown on nanoscale-patterned sapphire substrates

    NASA Astrophysics Data System (ADS)

    Lee, Fang-Wei; Ke, Wen-Cheng; Cheng, Chun-Hong; Liao, Bo-Wei; Chen, Wei-Kuo

    2016-07-01

    This study presents GaN thin films grown on nanoscale-patterned sapphire substrates (NPSSs) with different aspect ratios (ARs) using a homemade metal-organic chemical vapor deposition system. The anodic aluminum oxide (AAO) technique is used to prepare the dry etching mask. The cross-sectional view of the scanning electron microscope image shows that voids exist between the interface of the GaN thin film and the high-AR (i.e. ∼2) NPSS. In contrast, patterns on the low-AR (∼0.7) NPSS are filled full of GaN. The formation of voids on the high-AR NPSS is believed to be due to the enhancement of the lateral growth in the initial growth stage, and the quick-merging GaN thin film blocks the precursors from continuing to supply the bottom of the pattern. The atomic force microscopy images of GaN on bare sapphire show a layer-by-layer surface morphology, which becomes a step-flow surface morphology for GaN on a high-AR NPSS. The edge-type threading dislocation density can be reduced from 7.1 × 108 cm-2 for GaN on bare sapphire to 4.9 × 108 cm-2 for GaN on a high-AR NPSS. In addition, the carrier mobility increases from 85 cm2/Vs for GaN on bare sapphire to 199 cm2/Vs for GaN on a high-AR NPSS. However, the increased screw-type threading dislocation density for GaN on a low-AR NPSS is due to the competition of lateral growth on the flat-top patterns and vertical growth on the bottom of the patterns that causes the material quality of the GaN thin film to degenerate. Thus, the experimental results indicate that the AR of the particular patterning of a NPSS plays a crucial role in achieving GaN thin film with a high crystalline quality.

  11. Effects of Concentration and Substrate Type on Structure and Conductivity of p-Type CuS Thin Films Grown by Spray Pyrolysis Deposition

    NASA Astrophysics Data System (ADS)

    Sabah, Fayroz A.; Ahmed, Naser M.; Hassan, Z.

    2017-01-01

    Copper sulphide (CuS) thin films were grown upon Ti, indium tin oxide (ITO), and glass substrates by using spray pyrolysis deposition at 200°C. The films exhibited good adhesion compared to chemical bath deposition. CuCl2·2H2O and Na2S2O3·5H2O precursors were used as Cu2+ and S2- sources, respectively. Two concentrations (i.e., 0.2 M and 0.4 M) were selected in this study. X-ray diffraction analysis reveals that the films with 0.2 M showed only the formation of a covellite CuS phase having a hexagonal crystal structure with diffraction peaks of low intensity. For 0.4 M concentration, in addition to the covellite CuS phase, chalcocite Cu2S phase having a hexagonal crystal structure also appeared with relatively higher intensity peaks for all thin films. Field-emission scanning electron microscopy observations showed the formation of small grains for 0.2 M, whereas a mixture of grains with square-like shape and nanoplates were formed for 0.4 M. Depending on the 0.2 M and 0.4 M thin films thicknesses (3.2 μm and 4 μm, respectively), the band gap energy was obtained from optical measurements to be approximately 2.64 eV for 0.2 M (pure CuS phase), which slightly decreased up to 2.56 eV for 0.4 M concentration. Hall effect measurements showed that all grown films are p-type. The 0.2 M film exhibited much lower sheet resistance ( R sh = 33.96 Ω/Sq-55.70 Ω/Sq) compared to 0.4 M film ( R sh = 104.33 Ω/Sq-466.6 Ω/Sq). Moreover, for both concentrations, the films deposited onto ITO substrate showed the lowest sheet resistance ( R sh = 33.96 Ω/Sq-104.33 Ω/Sq).

  12. Electronic properties and structure of vanadia ultra-thin films grown on TiO 2( 1 1 0 ) in a water vapour ambient

    NASA Astrophysics Data System (ADS)

    Della Negra, Michela; Sambi, Mauro; Granozzi, Gaetano

    2001-12-01

    This paper reports on the deposition of a vanadium oxide ultra-thin film on TiO 2(1 1 0) by means of e-beam evaporation in an atmosphere of water vapour at room temperature. Photoelectron, X-ray excited Auger and valence band spectra have shown features very similar to those reported in the literature for vanadia ultra-thin films on TiO 2(1 1 0) identified as V 2O 3. An X-ray photoelectron diffraction analysis has been performed as a function of the overlayer thickness and after annealing treatments. It demonstrates that the overlayer grows ordered on the short range, pseudomorphic to the substrate, with a defective rutile crystal structure. The epitaxial relationship is maintained, with an approximately linear decrease in anisotropy, up to at least a coverage of 16 monolayers (ML); short annealing treatments are sufficient to restore the ordered structure, even on 20 ML thick films. Although in the bulk phase V 2O 3 is characterised by the corundum structure, which is also found when depositing vanadium oxide under similar experimental conditions on other substrates, such as Al 2O 3(0 0 0 1) and Pd(1 1 1), it appears that TiO 2(1 1 0) stabilises the isomorphic rutile lattice, which pertains to bulk VO 2 in its metallic phase, as well as to Magnéli phases of general formula V nO 2 n-1 . This particular behaviour of vanadia ultra-thin films grown on TiO 2 could be a key to understanding the catalytic activity and selectivity of the vanadia/titania systems in several chemical reactions.

  13. Effect of defects on reaction of NiO surface with Pb-contained solution

    NASA Astrophysics Data System (ADS)

    Kim, Jongjin; Hou, Binyang; Park, Changyong; Bahn, Chi Bum; Hoffman, Jason; Black, Jennifer; Bhattacharya, Anand; Balke, Nina; Hong, Hawoong; Kim, Ji Hyun; Hong, Seungbum

    2017-03-01

    In order to understand the role of defects in chemical reactions, we used two types of samples, which are molecular beam epitaxy (MBE) grown NiO(001) film on Mg(001) substrate as the defect free NiO prototype and NiO grown on Ni(110) single crystal as the one with defects. In-situ observations for oxide-liquid interfacial structure and surface morphology were performed for both samples in water and Pb-contained solution using high-resolution X-ray reflectivity and atomic force microscopy. For the MBE grown NiO, no significant changes were detected in the high-resolution X-ray reflectivity data with monotonic increase in roughness. Meanwhile, in the case of native grown NiO on Ni(110), significant changes in both the morphology and atomistic structure at the interface were observed when immersed in water and Pb-contained solution. Our results provide simple and direct experimental evidence of the role of the defects in chemical reaction of oxide surfaces with both water and Pb-contained solution.

  14. Effect of defects on reaction of NiO surface with Pb-contained solution

    PubMed Central

    Kim, Jongjin; Hou, Binyang; Park, Changyong; Bahn, Chi Bum; Hoffman, Jason; Black, Jennifer; Bhattacharya, Anand; Balke, Nina; Hong, Hawoong; Kim, Ji Hyun; Hong, Seungbum

    2017-01-01

    In order to understand the role of defects in chemical reactions, we used two types of samples, which are molecular beam epitaxy (MBE) grown NiO(001) film on Mg(001) substrate as the defect free NiO prototype and NiO grown on Ni(110) single crystal as the one with defects. In-situ observations for oxide-liquid interfacial structure and surface morphology were performed for both samples in water and Pb-contained solution using high-resolution X-ray reflectivity and atomic force microscopy. For the MBE grown NiO, no significant changes were detected in the high-resolution X-ray reflectivity data with monotonic increase in roughness. Meanwhile, in the case of native grown NiO on Ni(110), significant changes in both the morphology and atomistic structure at the interface were observed when immersed in water and Pb-contained solution. Our results provide simple and direct experimental evidence of the role of the defects in chemical reaction of oxide surfaces with both water and Pb-contained solution. PMID:28317881

  15. Sapphire substrate-induced effects in VO2 thin films grown by oxygen plasma-assisted pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Skuza, J. R.; Scott, D. W.; Pradhan, A. K.

    2015-11-01

    We investigate the structural and electronic properties of VO2 thin films on c-plane sapphire substrates with three different surface morphologies to control the strain at the substrate-film interface. Only non-annealed substrates with no discernible surface features (terraces) provided a suitable template for VO2 film growth with a semiconductor-metal transition (SMT), which was much lower than the bulk transition temperature. In addition to strain, oxygen vacancy concentration also affects the properties of VO2, which can be controlled through deposition conditions. Oxygen plasma-assisted pulsed laser deposition allows favorable conditions for VO2 film growth with SMTs that can be easily tailored for device applications.

  16. Optical and electrical studies of possible VO2 thin film nanostructures grown using laser ablated V2O5

    NASA Astrophysics Data System (ADS)

    Zinzuvadiya, Sushant; Joshi, U. S.

    2017-05-01

    The metal insulator transition (MIT) has been a focus of study for many years to researchers as the results are expected to help its future device applications in electronics. VO2 in its pure crystalline phase exhibit reversible MIT at about 68 °C, making it promising for memory based devices. Due to the multivalent nature of vanadium, synthesis of stoichiometric VO2 is a challenge. In this communication, we report the results of electrical and surface structural studies of Vanadium Oxide thin film nanostructures. The films were prepared using Pulsed Laser Deposition (PLD) Technique on quartz substrates. XRD revealed single orthorhombic phase. A smooth surface topography showing 58 nm average grain size with highly mono-dispersed grain distribution as studied by Atomic Force Microscopy (AFM). The temperatures dependant resistance measurements exhibited a clear and reversible MIT near 280° C. The band-gap was estimated to be 3.5 eV using the UV-Vis. spectroscopy.

  17. Solution-grown small-molecule organic semiconductor with enhanced crystal alignment and areal coverage for organic thin film transistors

    DOE PAGES

    Bi, Sheng; He, Zhengran; Chen, Jihua; ...

    2015-07-24

    Drop casting of small-molecule organic semiconductors typically forms crystals with random orientation and poor areal coverage, which leads to significant performance variations of organic thin-film transistors (OTFTs). In this study, we utilize the controlled evaporative self-assembly (CESA) method combined with binary solvent system to control the crystal growth. A small-molecule organic semiconductor,2,5-Di-(2-ethylhexyl)-3,6-bis(5"-n-hexyl-2,2',5',2"]terthiophen-5-yl)-pyrrolo[3,4-c]pyrrole-1,4-dione (SMDPPEH), is used as an example to demonstrate the effectiveness of our approach. By optimizing the double solvent ratios, well-aligned SMDPPEH crystals with significantly improved areal coverage were achieved. As a result, the SMDPPEH based OTFTs exhibit a mobility of 1.6 × 10-2 cm2/V s, which is themore » highest mobility from SMDPPEH ever reported.« less

  18. Solution-grown small-molecule organic semiconductor with enhanced crystal alignment and areal coverage for organic thin film transistors

    SciTech Connect

    Bi, Sheng; He, Zhengran; Chen, Jihua; Li, Dawen

    2015-07-24

    Drop casting of small-molecule organic semiconductors typically forms crystals with random orientation and poor areal coverage, which leads to significant performance variations of organic thin-film transistors (OTFTs). In this study, we utilize the controlled evaporative self-assembly (CESA) method combined with binary solvent system to control the crystal growth. A small-molecule organic semiconductor,2,5-Di-(2-ethylhexyl)-3,6-bis(5"-n-hexyl-2,2',5',2"]terthiophen-5-yl)-pyrrolo[3,4-c]pyrrole-1,4-dione (SMDPPEH), is used as an example to demonstrate the effectiveness of our approach. By optimizing the double solvent ratios, well-aligned SMDPPEH crystals with significantly improved areal coverage were achieved. As a result, the SMDPPEH based OTFTs exhibit a mobility of 1.6 × 10-2 cm2/V s, which is the highest mobility from SMDPPEH ever reported.

  19. Structure and composition of zirconium carbide thin-film grown by ion beam sputtering for optical applications

    NASA Astrophysics Data System (ADS)

    Singh, Amol; Modi, Mohammed H.; Dhawan, Rajnish; Lodha, G. S.

    2014-04-01

    Thin film of compound material ZrC was deposited on Si (100) wafer using ion beam sputtering method. The deposition was carried out at room temperature and at base pressure of 3×10-5 Pa. X-ray photoelectron spectroscopy (XPS) measurements were performed for determining the surface chemical compositions. Grazing incidence x-ray reflectivity (GIXRR) measurements were performed to study the film thickness, roughness and density. From GIXRR curve roughness value of the film was found less than 1 nm indicating smooth surface morphology. Films density was found 6.51 g/cm3, which is close to bulk density. Atomic force microscopy (AFM) measurements were performed to check the surface morphology. AFM investigation showed that the film surface is smooth, which corroborate the GIXRR data. Figure 2 of the original article PDF file, as supplied to AIP Publishing, contained a PDF processing error. This article was updated on 12 May 2014 to correct that error.

  20. Bias-assisted atomic force microscope nanolithography on NbS2 thin films grown by chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Bark, Hunyoung; Kwon, Sanghyuk; Lee, Changgu

    2016-12-01

    Niobium disulfide, one of the metallic transition metal dichalcogenides, has a high potential as an electrode material for electronic devices made of 2D materials. Here, we investigated the bias-assisted atomic force microscope nanolithography of NbS2 thin films synthesized by chemical vapor deposition. We analyzed the lithographed pattern using Raman spectroscopy, transmission electron microscopy and friction force microscopy. These analyses showed that lines having various widths and thicknesses could be generated using the lithography technique by simply varying the scan speed and applied voltage. These analyses also revealed that the NbS2 film transformed from a layered crystalline structure into an amorphous structure upon being lithographed. By generating four line segments forming a square and measuring I/V curves inside and outside of the square, the electrical properties of the lithographed material were characterized. These analyses indicate that NbS2 became hydrogenated and an insulator upon being lithographed.

  1. Substrate-induced disorder in V2O3 thin films grown on annealed c-plane sapphire substrates

    NASA Astrophysics Data System (ADS)

    Brockman, J.; Samant, M. G.; Roche, K. P.; Parkin, S. S. P.

    2012-07-01

    We investigate the structural and electronic properties of V2O3 thin films deposited by oxygen plasma-assisted molecular beam epitaxy onto annealed and unannealed c-plane sapphire substrates. Annealing the substrates before growth to produce ultra-smooth surfaces improved initial epitaxy, according to in situ reflection high-energy electron diffraction. Surprisingly, films deposited on annealed substrates had a more island-like surface, broader x-ray diffraction peaks, and an increased resistivity of V2O3's normally metallic high-temperature phase. We attribute these results to enhanced strain coupling at the interface between the substrate and film, highlighting the vulnerability of V2O3's strongly correlated metallic phase to crystalline defects and structural disorder.

  2. Study of high {Tc} superconducting thin films grown by MOCVD. Final report, July 1, 1986--April 30, 1990

    SciTech Connect

    Erbil, A.

    1990-12-31

    Work is described briefly, which was carried out on development of techniques to grow metal-semiconductor superlattices (artificially layered materials) and on the copper oxide based susperconductors (naturally layered materials). The current growth technique utilized is metalorganic chemical vapor deposition (MOCVD). CdTe, PbTe, La, LaTe, and Bi{sub 2}Te{sub 3} were deposited, mostly on GaAs. Several YBa{sub 2}Cu{sub 3}O{sub 7} compounds were obtained with possible superconductivity at temperatures up to 550 K (1 part in 10{sup 4}). YBa{sub 2}Cu{sub 3}O{sub 7{minus}x} and Tl{sub 2}CaBa{sub 2}Cu{sub 2}O{sub y} thin films were deposited by MOCVD on common substrates such as glass.

  3. Structural and magnetic properties of epitaxial delafossite CuFeO{sub 2} thin films grown by pulsed laser deposition

    SciTech Connect

    Joshi, Toyanath; Senty, Tess R.; Trappen, Robbyn; Zhou, Jinling; Borisov, Pavel; Holcomb, Mikel B.; Bristow, Alan D.; Lederman, David; Chen, Song; Song, Xueyan; Ferrari, Piero; Cabrera, Alejandro L.

    2015-01-07

    Growth of pure phase delafossite CuFeO{sub 2} thin films on Al{sub 2}O{sub 3} (00.1) substrates by pulsed laser deposition was systematically investigated as a function of growth temperature and oxygen pressure. X-ray diffraction, transmission electron microscopy, Raman scattering, and x-ray absorption spectroscopy confirmed the existence of the delafossite phase. Infrared reflectivity spectra determined a band edge at 1.15 eV, in agreement with the bulk delafossite data. Magnetization measurements on CuFeO{sub 2} films demonstrated a phase transition at T{sub C} ≈ 15 ± 1 K, which agrees with the first antiferromagnetic transition at 14 K in the bulk CuFeO{sub 2}. Low temperature magnetic phase is best described by commensurate, weak ferromagnetic spin ordering along the c-axis.

  4. Deposition And Characterization of (Ti,Zr)N Thin Films Grown Through PAPVD By The Pulsed Arc Technique

    SciTech Connect

    Marulanda, D. M.; Trujillo, O.; Devia, A.

    2006-12-04

    The Plasma Assisted Physic Vapor Deposition (PAPVD) by the pulsed arc technique has been used for deposition of Titanium Zirconium Nitride (Ti,Zr)N coatings, using a segmented target of TiZr. The deposition was performed in a vacuum chamber with two faced electrodes (target and substrate) using nitrogen as working gas, and a power-controlled source used to produce the arc discharges. Films were deposited on stainless steel 304, and they were characterized using the X-Ray Photoelectron Spectroscopy (XPS), X-Ray Diffraction (XRD), Energy Dispersion Spectroscopy (EDS) and Scanning Probe Microscopy (SPM) techniques. The XRD patterns show different planes in which the film grows. Through SPM, using Atomic Force Microscopy (AFM) and Lateral Force Microscopy (LFM) modes, a nanotribologic study of the thin film was made, determining hardness and friction coefficient.

  5. Conductivity control of Sn-doped α-Ga2O3 thin films grown on sapphire substrates

    NASA Astrophysics Data System (ADS)

    Akaiwa, Kazuaki; Kaneko, Kentaro; Ichino, Kunio; Fujita, Shizuo

    2016-12-01

    We achieved the successful fabrication of Sn-doped α-Ga2O3 thin films with higher electron mobility and wider conductivity controls by improving the crystal quality. α-Ga2O3 films showed n-type conductivity with a maximum electron mobility of 24 cm2 V-1 s-1. The carrier concentration was successfully controlled in the range of 1017-1019 cm-3. Crystal defects such as dislocations severely compensate the free carriers in α-Ga2O3 films and restrict the mobility at low carrier concentrations. Therefore, to achieve further conductivity control and higher mobility, improving the crystallinity of α-Ga2O3 films is necessary.

  6. Defect study of molecular beam epitaxy grown undoped GaInNAsSb thin film using junction-capacitance spectroscopy

    SciTech Connect

    Monirul Islam, Muhammad; Miyashita, Naoya; Ahsan, Nazmul; Okada, Yoshitaka

    2013-02-18

    Defects in undoped GaInNAsSb thin film (i-GaInNAsSb) were investigated by junction-capacitance technique using admittance and transient photocapacitance (TPC) spectroscopy. An electron trap D2 was identified at 0.34 eV below the conduction band (E{sub C}) of i-GaInNAsSb using admittance spectroscopy. Optical transition of valance band (E{sub V}) electrons to a localized state OH1 (E{sub V} + 0.75 eV) was manifested in negative TPC signal. Combined activation energy of OH1 and D2 defect corresponds to the band-gap of i-GaInNAsSb, suggesting that OH1/D2 acts as an efficient recombination center. TPC signal at {approx}1.59 eV above E{sub V} was attributed to the nitrogen-induced localized state in GaInNAsSb.

  7. Performance of Erbium-doped TiO2 thin film grown by physical vapor deposition technique

    NASA Astrophysics Data System (ADS)

    Lahiri, Rini; Ghosh, Anupam; Dwivedi, Shyam Murli Manohar Dhar; Chakrabartty, Shubhro; Chinnamuthu, P.; Mondal, Aniruddha

    2017-09-01

    Undoped and Erbium-doped TiO2 thin films (Er:TiO2 TFs) were fabricated on the n-type Si substrate using physical vapour deposition technique. Field emission scanning electron microscope showed the morphological change in the structure of Er:TiO2 TF as compared to undoped sample. Energy dispersive X-ray spectroscopy (EDX) confirmed the Er doping in the TiO2 thin film (TF). The XRD and Raman spectrum showed the presence of anatase phase TiO2 and Er2O3 in the Er:TiO2 TF. The Raman scattering depicted additional number of vibrational modes for Er:TiO2 TF due to the presence of Er as compared to the undoped TiO2 TF. The UV-Vis absorption measurement showed that Er:TiO2 TF had approximately 1.2 times more absorption over the undoped TiO2 TF in the range of 300-400 nm. The main band transition, i.e., the transition between the oxygen (2p) state and the Ti (3d) state was obtained at 3.0 eV for undoped TiO2 and at 3.2 eV for Er:TiO2 TF, respectively. The photo responsivity measurement was done on both the detectors, where Er:TiO2 TF detector showed better detectivity ( D *), noise equivalent power and temporal response as compared to undoped detector under ultra-violet illumination.

  8. Influence of flow rate on different properties of diamond-like nanocomposite thin films grown by PECVD

    NASA Astrophysics Data System (ADS)

    Santra, T. S.; Bhattacharyya, T. K.; Tseng, F. G.; Barik, T. K.

    2012-06-01

    Diamond-like nanocomposite (DLN) thin films were deposited on pyrex glass substrate using different flow rate of haxamethyldisiloxane (HMDSO) based liquid precursor with nitrogen gas as a glow discharged decomposition by plasma enhanced chemical vapor deposition (PECVD) technique. The significant influence of different precursor flow rates on refractive index and thickness of the DLN films was measured by using spectroscopic filmatrics and DEKTAK profilometer. Optical transparency of the DLN thin films was analyzed by UV-VIS-NIR spectrometer. FTIR spectroscopy, provides the information about shifted bonds like SiC2, Si-C, Si-O, C-C, Si-H, C-H, N-H, and O-H with different precursor flow rate. We have estimated the hardness of the DLN films from Raman spectroscopy using Gaussian deconvolution method and tried to investigate the correlation between hardness, refractive index and thickness of the films with different precursor flow rates. The composition and surface morphology of the DLN films were investigated by X-ray photo electron spectroscopy (XPS) and atomic force microscopy (AFM) respectively. We have analyzed the hardness by intensity ratio (ID/IG) of D and G peaks and correlates with hardness measurement by nanoindentation test where hardness increases from 27.8 μl/min to 80.6μl/min and then decreases with increase of flow rate from 80.6μl/min to 149.5μl/min. Finally, we correlates different parameters of structural, optical and tribological properties like film-thickness, refractive index, light transmission, hardness, surface roughness, modulus of elasticity, contact angle etc. with different precursor flow rates of DLN films.

  9. Boron nitride phosphide thin films grown on quartz substrate by hot-filament and plasma-assisted chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, X. W.; Xu, S. Y.; Han, G. R.

    2004-10-01

    Boron nitride phosphide films are, for the first time, grown on transparent quartz substrate by hot filament and radio-frequency plasma co-assisted chemical vapor deposition technique. XPS, XRD, SEM, and UV measurements are performed to study the chemical composition, crystallization, microstructure, and optical absorption, respectively. A centipede-like microstructure and undulating ground morphology on the film surface are observed, and their growth mechanism is speculated upon. The chemical composition is determined as BN1-xPx, whose characteristic XRD peak is preliminarily identified. The optical band gap can be modulated between 5.52 eV and 3.74 eV, simply by adjusting the phosphorus content in BN1-xPx through modifying the PH3 flux during the film-deposition process. The merits of the BN1-xPx film, such as high ultraviolet photoelectric sensitivity with negligible sensitivity in the visible region, modifiable wide optical band gap, and good adhesion on transparent substrate, suggest potential applications for ultraviolet photo-electronics.

  10. Investigation of NbNx thin films and nanoparticles grown by pulsed laser deposition and thermal diffusion

    NASA Astrophysics Data System (ADS)

    Hassan Farha, Ashraf

    Niobium nitride films (NbNx) were grown on Nb and Si (100) substrates using pulsed laser deposition (PLD), laser heating, and thermal diffusion methods. Niobium nitride films were deposited on Nb substrates using PLD with a Q-switched Nd: YAG laser (lambda = 1064 nm, 40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, different nitrogen background pressures and deposition temperatures. The effect of changing PLD parameters for films done by PLD was studied. The seen observations establish guidelines for adjusting the laser parameters to achieve the desired morphology and phase of the grown NbNx films. When the fabrication parameters are fixed, except for laser fluence, surface roughness, deposition rate, nitrogen content, and grain size increases with increasing laser fluence. Increasing nitrogen background pressure leads to change in the phase structure of the NbNx films from mixed -Nb 2N and cubic delta-NbN phases to single hexagonal beta- Nb 2N. A change in substrate temperature led to a pronounced change in the preferred orientation of the crystal structure, the phase transformation, surface roughness, and composition of the films. The structural, electronic, and nanomechanical properties of niobium nitride PLD deposited at different nitrogen pressures (26.7-66.7 Pa) on Si(100) were investigated. The NbNx, films exhibited a cubic delta-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The highly-textured delta-NbN films have a Tc up to 15.07 K. The film was deposited at a nitrogen background pressure of 66.7 Pa exhibited improved superconducting properties and showed higher hardness values as compared to films deposited at lower nitrogen pressures. NbN nanoclusters that were deposited on carbon coated Cu-grids using PLD at laser fluence of 8 J/cm2 were observed. Niobium nitride is prepared by heating of Nb sample in a reactive nitrogen atmosphere (133 Pa

  11. The effects of oxygen pressure on disordering and magneto-transport properties of Ba{sub 2}FeMoO{sub 6} thin films grown via pulsed laser deposition

    SciTech Connect

    Kim, Kyeong-Won; Mhin, Sungwook; Jones, Jacob L.; Norton, David P.; Ghosh, Siddhartha Buvaev, Sanal; Hebard, Arthur F.

    2015-07-21

    Epitaxial Ba{sub 2}FeMoO{sub 6} thin films were grown via pulsed laser deposition under low oxygen pressure and their structural, chemical, and magnetic properties were examined, focusing on the effects of oxygen pressure. The chemical disorder, off-stoichiometry in B site cations (Fe and Mo) increased with increasing oxygen pressure and thus magnetic properties were degraded. Interestingly, in contrast, negative magneto-resistance, which is the characteristics of this double perovskite material, was enhanced with increasing oxygen pressure. It is believed that phase segregation of highly disordered thin films is responsible for the increased magneto-resistance of thin films grown at high oxygen pressure. The anomalous Hall effect, which behaves hole-like, was also observed due to spin-polarized itinerant electrons under low magnetic field below 1 T and the ordinary electron-like Hall effect was dominant at higher magnetic fields.

  12. Cu-dependent phase transition in polycrystalline CuGaSe2 thin films grown by three-stage process

    NASA Astrophysics Data System (ADS)

    Islam, M. M.; Yamada, A.; Sakurai, T.; Kubota, M.; Ishizuka, S.; Matsubara, K.; Niki, S.; Akimoto, K.

    2011-07-01

    The Cu-dependent phase transition in polycrystalline CuGaSe2 thin films has been studied by an electron probe micro-analyzer (EPMA) and the synchrotron x-ray diffraction method. A Cu-deficiency parameter, Z, defined as (1 - Cu/Ga) was used to study the phase transition. Upon increasing the Z-value, the composition of the films on the Cu2Se-Ga2Se3 pseudo binary tie line was found to shift from the stoichiometric CuGaSe2 (1:1:2) (Z = 0) to the Ga-rich composition through the formation of several ordered defect compounds.The structural modification in the Cu-poor CuGaSe2 film has been investigated by the synchrotron x-ray diffraction method. The existence of the Cu-poor surface phase over the near-stoichiometric bulk CuGaSe2 film was confirmed by the fitting of the accelerated voltage dependent EPMA data.

  13. Structural and magnetic properties of Co-doped ZnO thin films grown by ultrasonic spray pyrolysis method

    NASA Astrophysics Data System (ADS)

    Baghdad, R.; Lemée, N.; Lamura, G.; Zeinert, A.; Hadj-Zoubir, N.; Bousmaha, M.; Bezzerrouk, M. A.; Bouyanfif, H.; Allouche, B.; Zellama, K.

    2017-04-01

    Cobalt-doped ZnO thin films with several different percentage of Co from 0 up to 15 at% were synthesized via a cheap, simple and versatile method i.e. ultrasonic spray pyrolysis at atmospheric pressure and a substrate temperature of 350 °C. The structure of the as-prepared samples was characterized by X-ray diffraction (XRD), Raman spectroscopy and FTIR. The Co-doping effect is revealed by the presence of three additional peaks around 235, 470 and 538 cm-1 respect to the Raman spectra of the unsubstituted film. Fourier transform infrared spectroscopy (FTIR) put in evidence the decrease of the bond force constant f with increasing Co-doping. By ultra-violet visible near infrared (UV-Vis-NIR) spectroscopy on Co-doped samples it was possible to show the presence of additional absorption bands at approximately 570, 620 and 660 nm suggesting that Co2+ ions do not change their oxidation when substituted to zinc and the ZnO lattice does not change its wurtzite structure as well. Finally, all our samples exhibit a paramagnetic behavior without any trace of intrinsic room temperature ferromagnetism.

  14. Ultra-high mobility transparent organic thin film transistors grown by an off-centre spin-coating method.

    PubMed

    Yuan, Yongbo; Giri, Gaurav; Ayzner, Alexander L; Zoombelt, Arjan P; Mannsfeld, Stefan C B; Chen, Jihua; Nordlund, Dennis; Toney, Michael F; Huang, Jinsong; Bao, Zhenan

    2014-01-01

    Organic semiconductors with higher carrier mobility and better transparency have been actively pursued for numerous applications, such as flat-panel display backplane and sensor arrays. The carrier mobility is an important figure of merit and is sensitively influenced by the crystallinity and the molecular arrangement in a crystal lattice. Here we describe the growth of a highly aligned meta-stable structure of 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT) from a blended solution of C8-BTBT and polystyrene by using a novel off-centre spin-coating method. Combined with a vertical phase separation of the blend, the highly aligned, meta-stable C8-BTBT films provide a significantly increased thin film transistor hole mobility up to 43 cm(2) Vs(-1) (25 cm(2) Vs(-1) on average), which is the highest value reported to date for all organic molecules. The resulting transistors show high transparency of >90% over the visible spectrum, indicating their potential for transparent, high-performance organic electronics.

  15. Morphology, composition and electrical properties of SnO{sub 2}:Cl thin films grown by atomic layer deposition

    SciTech Connect

    Cheng, Hsyi-En Wen, Chia-Hui; Hsu, Ching-Ming

    2016-01-15

    Chlorine doped SnO{sub 2} thin films were prepared using atomic layer deposition at temperatures between 300 and 450 °C using SnCl{sub 4} and H{sub 2}O as the reactants. Composition, structure, surface morphology, and electrical properties of the as-deposited films were examined. Results showed that the as-deposited SnO{sub 2} films all exhibited rutile structure with [O]/[Sn] ratios between 1.35 and 1.40. The electrical conductivity was found independent on [O]/[Sn] ratio but dependent on chlorine doping concentration, grain size, and surface morphology. The 300 °C-deposited film performed a higher electrical conductivity of 315 S/cm due to its higher chlorine doping level, larger grain size, and smoother film surface. The existence of Sn{sup 2+} oxidation state was demonstrated to minimize the effects of chlorine on raising the electrical conductivity of films.

  16. Effect of sulfurization time on the properties of copper zinc tin sulfide thin films grown by electrochemical deposition.

    PubMed

    Aldalbahi, Ali; Mkawi, E M; Ibrahim, K; Farrukh, M A

    2016-09-07

    We report growth of quaternary Cu2 ZnSnS4 (CZTS) thin films prepared by the electrochemical deposition from salt precursors containing Cu (II), Zn (II) and Sn (IV) metals. The influence of different sulfurization times t (t = 75, 90, 105, and 120 min) on the structural, compositional, morphological, and optical properties, as well as on the electrical properties is studied. The films sulfurized 2 hours showed a prominent kesterite phase with a nearly stoichiometric composition. Samples were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Raman and UV-VIS-NIR spectrometer at different stages of work. X-ray diffraction and Raman spectroscopy analyses confirmed the formation of phase-pure CZTS films. (FESEM) shows that compact and dense morphology and enhanced photo-sensitivity. STEM - EDS elemental map of CZTS cross-section confirms homogeneous distribution. From optical study, energy gap was enlarged with a changed sulfurization times in the range of 1.37-1.47 eV.

  17. Reaction kinetics of CuInSe2 thin films grown from bilayer InSe/CuSe precursors

    NASA Astrophysics Data System (ADS)

    Kim, S.; Kim, W. K.; Kaczynski, R. M.; Acher, R. D.; Yoon, S.; Anderson, T. J.; Crisalle, O. D.; Payzant, E. A.; Li, S. S.

    2005-03-01

    The reaction kinetics for the formation of CuInSe2 thin films from a stacked bilayer precursor consisting of InSe and CuSe was studied by means of in situ high-temperature x-ray diffraction. In particular, the isothermal phase evolution of the glass/InSe/CuSe precursor was observed at different temperatures. The pathway produces a CuInSe2 diffusion barrier layer that also functions as a nucleation barrier. Hence, amorphous and crystalline phases simultaneously grow during isothermal processing. The shape of the time-resolved fractional reaction curve exhibits a deceleratory behavior, consistent with the presence of a diffusion-controlled reaction mechanism. Analyses based on Avrami and parabolic-rate laws were conducted. The Avrami exponent for each isothermal reaction is in the range 0.5-0.8, which indicates that the growth reaction is dominantly one-dimensional diffusion controlled. The estimated apparent activation energy for this reaction is 66.0 kJ/mol. The results based on the parabolic rate model are consistent with the Avrami analysis, yielding a similar apparent activation energy value, and thus supporting the conclusion that the process is one-dimensional diffusion controlled.

  18. Effect of sulfurization time on the properties of copper zinc tin sulfide thin films grown by electrochemical deposition

    PubMed Central

    Aldalbahi, Ali; Mkawi, E. M.; Ibrahim, K.; Farrukh, M. A.

    2016-01-01

    We report growth of quaternary Cu2 ZnSnS4 (CZTS) thin films prepared by the electrochemical deposition from salt precursors containing Cu (II), Zn (II) and Sn (IV) metals. The influence of different sulfurization times t (t = 75, 90, 105, and 120 min) on the structural, compositional, morphological, and optical properties, as well as on the electrical properties is studied. The films sulfurized 2 hours showed a prominent kesterite phase with a nearly stoichiometric composition. Samples were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Raman and UV-VIS-NIR spectrometer at different stages of work. X-ray diffraction and Raman spectroscopy analyses confirmed the formation of phase-pure CZTS films. (FESEM) shows that compact and dense morphology and enhanced photo-sensitivity. STEM - EDS elemental map of CZTS cross-section confirms homogeneous distribution. From optical study, energy gap was enlarged with a changed sulfurization times in the range of 1.37–1.47 eV. PMID:27600023

  19. Synthesis and characterization of MoB{sub 2−x} thin films grown by nonreactive DC magnetron sputtering

    SciTech Connect

    Malinovskis, Paulius Lewin, Erik; Jansson, Ulf; Palisaitis, Justinas; Persson, Per O. Å.

    2016-05-15

    DC magnetron sputtering was used to deposit molybdenum boride thin films for potential low-friction applications. The films exhibit a nanocomposite structure with ∼10 nm large MoB{sub 2−x} (x > 0.4) grains surrounded by a boron-rich tissue phase. The preferred formation of the metastable and substoichiometric hP3-MoB{sub 2} structure (AlB{sub 2}-type) is explained with kinetic constraints to form the thermodynamically stable hR18-MoB{sub 2} phase with a very complex crystal structure. Nanoindentation revealed a relatively high hardness of (29 ± 2) GPa, which is higher than bulk samples. The high hardness can be explained by a hardening effect associated with the nanocomposite microstructure where the surrounding tissue phase restricts dislocation movement. A tribological study confirmed a significant formation of a tribofilm consisting of molybdenum oxide and boron oxide, however, without any lubricating effects at room temperature.

  20. Influence of substrate materials on the properties of CdTe thin films grown by hot-wall epitaxy

    NASA Astrophysics Data System (ADS)

    Bilevych, Ye.; Soshnikov, A.; Darchuk, L.; Apatskaya, M.; Tsybrii, Z.; Vuychik, M.; Boka, A.; Sizov, F.; Boelling, O.; Sulkio-Cleff, B.

    2005-02-01

    Growth of high-quality CdTe thin films by hot-wall epitaxy (HWE) under different temperature conditions and the control of their physical, electrical and structural properties have been examined by various ways. CdTe (1 1 0), Zn 0.04Cd 0.96Te (1 1 1), Hg 0.2Cd 0.8Te (1 1 1), Si (1 1 1) and BaF 2 (1 1 1) were used as substrates. The obtained films have the cut-off wavelength at 0.84-0.85 μm and the transmission of about 55-60% out of the fundamental absorption domain. The current-voltage investigations have shown that the contact properties strongly depend on the contact material and contact fabrication method and less depend on substrate materials. The film-specific resistances (4-7)×10 4 Ω cm were determined. The CdTe deposition (layer thickness about 1000 Å) on Cd xHg 1-xTe resulted in significant increase in photodiodes electrical parameters. All samples showed the crystalline structure according to the XRD data with strong influence on lattice mismatch between CdTe and substrate materials. Atomic force microscope (AFM) investigations have shown a smooth and defect-free surface with a roughness range of 15-100 nm for 50 μm of basic length.

  1. Effect of sulfurization time on the properties of copper zinc tin sulfide thin films grown by electrochemical deposition

    NASA Astrophysics Data System (ADS)

    Aldalbahi, Ali; Mkawi, E. M.; Ibrahim, K.; Farrukh, M. A.

    2016-09-01

    We report growth of quaternary Cu2 ZnSnS4 (CZTS) thin films prepared by the electrochemical deposition from salt precursors containing Cu (II), Zn (II) and Sn (IV) metals. The influence of different sulfurization times t (t = 75, 90, 105, and 120 min) on the structural, compositional, morphological, and optical properties, as well as on the electrical properties is studied. The films sulfurized 2 hours showed a prominent kesterite phase with a nearly stoichiometric composition. Samples were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Raman and UV-VIS-NIR spectrometer at different stages of work. X-ray diffraction and Raman spectroscopy analyses confirmed the formation of phase-pure CZTS films. (FESEM) shows that compact and dense morphology and enhanced photo-sensitivity. STEM - EDS elemental map of CZTS cross-section confirms homogeneous distribution. From optical study, energy gap was enlarged with a changed sulfurization times in the range of 1.37–1.47 eV.

  2. Role of surface-electrical properties on the cell-viability of carbon thin films grown in nanodomain morphology

    NASA Astrophysics Data System (ADS)

    Javid, Amjed; Kumar, Manish; Yoon, Seokyoung; Lee, Jung Heon; Tajima, Satomi; Hori, Masaru; Geon Han, Jeon

    2016-07-01

    Carbon thin films, having a combination of unique physical and chemical properties, exhibit an interesting biocompatibility and biological response to living entities. Here, the carbon films are developed in the morphology form of nano-domains with nanoscale inter-domain separations, tuned by plasma conditions in the facing target magnetron sputtering process. The wettability and surface energy are found to have a close relation to the inter-domain separations. The chemical structure of carbon films exhibited the relative enhancement of sp3 in comparison to sp2 with the increase of domain separations. The cell-viability of these films shows promising results for L929 mouse fibroblast and Saos-2 bone cells, when inter-domain separation is increased. Electrical conductivity and surface energy are identified to play the key role in different time-scales during the cell-proliferation process. The contribution from electrical conductivity is dominant in the beginning of the cultivation, whereas with the passage of time (~3-5 d) the surface energy takes control over conductivity to enhance the cell proliferation.

  3. Optical properties of nanocrystalline Y2O3 thin films grown on quartz substrates by electron beam deposition

    NASA Astrophysics Data System (ADS)

    Wiktorczyk, Tadeusz; Biegański, Piotr; Serafińczuk, Jarosław

    2016-09-01

    Yttrium oxide thin films of a thickness 221-341 nm were formed onto quartz substrates by reactive physical vapor deposition in an oxygen atmosphere. An electron beam gun was applied as a deposition source. The effect of substrate temperature during film deposition (in the range of 323-673 K) on film structure, surface morphology and optical properties was investigated. The surface morphology studies (with atomic force microscopy and diffuse spectra reflectivity) show that the film surface was relatively smooth with RMS surface roughness in the range of 1.7-3.8 nm. XRD analysis has revealed that all diffraction lines belong to a cubic Y2O3 structure. The films consisted of small nanocrystals. Their average grain size increases from 1.6 nm to 22 nm, with substrate temperature rising from 323 K to 673 K. Optical examinations of transmittance and reflectance were performed in the spectral range of 0.2-2.5 μm. Optical constants and their dispersion curves were determined. Values of the refractive index of the films were in the range of n = 1.79-1.90 (at 0.55 μm) for substrate temperature during film deposition of 323-673 K. The changes in the refractive index upon substrate temperature correspond very well with the increase in the nanocrystals grain diameter and with film porosity.

  4. Structural properties of Bi{sub 2}Te{sub 3} topological insulator thin films grown by molecular beam epitaxy on (111) BaF{sub 2} substrates

    SciTech Connect

    Fornari, Celso I. Rappl, Paulo H. O.; Abramof, Eduardo; Morelhão, Sérgio L.

    2016-04-28

    Structural properties of topological insulator bismuth telluride films grown epitaxially on (111) BaF{sub 2} with a fixed Bi{sub 2}Te{sub 3} beam flux were systematically investigated as a function of substrate temperature and additional Te flux. A layer-by-layer growth mode is observed since the early stages of epitaxy and remains throughout the whole deposition. Composition of the epitaxial films produced here stays between Bi{sub 2}Te{sub 3} and Bi{sub 4}Te{sub 5}, as determined from the comparison of the measured x-ray diffraction curves with calculations. The substrate temperature region, where the growth rate remains constant, is found to be the most appropriate to obtain ordered Bi{sub 2}Te{sub 3} films. Line width of the L = 18 Bi{sub 2}Te{sub 3} diffraction peaks as low as 140 arcsec was obtained, indicating high crystalline quality. Twinning domains density rises with increasing growth temperature and reducing Te extra flux. X-ray reflectivity curves of pure Bi{sub 2}Te{sub 3} films with thickness from 165 to 8 nm exhibited well defined interference fringes, evidencing homogeneous layers with smooth surface. Our results demonstrate that Bi{sub 2}Te{sub 3} films with very well controlled structural parameters can be obtained. High structural quality Bi{sub 2}Te{sub 3} films as thin as only eight quintuple layers grown here are promising candidates for intrinsic topological insulator.

  5. Magnetic and structural properties of BiFeO3 thin films grown epitaxially on SrTiO3/Si substrates

    NASA Astrophysics Data System (ADS)

    Laughlin, Ryan P.; Currie, Daniel A.; Contreras-Guererro, Rocio; Dedigama, Aruna; Priyantha, Weerasinghe; Droopad, Ravindranath; Theodoropoulou, Nikoleta; Gao, Peng; Pan, Xiaoqing

    2013-05-01

    The integration of oxides with semiconductors is important for the technological advancement of the next generation electronics. Concomitant ferroelectric and antiferromagnetic (AF) behavior is demonstrated in single crystal BiFeO3 (BFO) films grown on 20 nm SrTiO3 (STO) virtual substrates on Si(100) using molecular beam epitaxy (MBE). STO thin films are grown in an oxide MBE chamber by co-deposition of Sr, Ti, and molecular O2. Careful control of the O2 during nucleation produced commensurate growth of STO on Si. The sequence of the steps allows for the suppression of an amorphous SiO2 layer. This STO(20 nm)/Si structure was used as a virtual substrate for MBE deposition of BFO on Si without breaking vacuum. BFO was deposited using Fe and O2 plasma with an overpressure of Bi flux, the growth rate was controlled by the incoming Fe flux. The reflection high energy electron diffraction image shows a 2-D growth front with a 6-fold surface reconstruction under optimized O2 pressure of 5 × 10-8 mbar. Cross-sectional transmission electron microscopy (TEM) confirms the high crystallinity of the films and shows sharp, atomically flat interfaces. The selected area diffraction pattern (SADP) reveals that BFO grows in a distorted rhombohedral crystal structure. X-ray diffraction does not show formation of second phases and is consistent with the TEM and SADP results. The BFO films show AF behavior with a Neel temperature that exceeds 350 K, as expected (TN = 673 K) and with a residual ferromagnetic behavior that decreases with film thickness and is consistent with the G-type AF due to the canted spins. The saturation magnetization per unit volume for a 40 nm thick film was 180 emu/cm3 at an in-plane magnetic field of 8 kOe. The ferroelectric behavior of the films was verified using piezoresponse force microscopy.

  6. Ultrathin NiO nanoflakes electrode materials for supercapacitors

    NASA Astrophysics Data System (ADS)

    Xiao, Huanhao; Qu, Fengyu; Wu, Xiang

    2016-01-01

    In this work, large scale ultrathin NiO nanoflakes grown on nickel foam have been successfully obtained by a facile, low cost and eco-friendly route under mild temperature. The average thickness of the as-obtained NiO nanoflakes is about 10 nm. And they possess large surface area of 89.56 m2 g-1 and the dominant pore size of 2.313 nm. The electrochemical properties of the obtained product were evaluated by cyclic voltammetry (CV), galvanostatic charge-discharge measurement and electrochemical impedance spectroscopy (EIS). The electrochemical tests demonstrate the highest discharge areal capacitance of 870 mF cm-2 at 1 mA cm-2 and excellent long cycle-life stability with 84.2% of its discharge areal capacitance retention after 6000 cycles at the current density of 10 mA cm-2. The remarkable electrochemical capacitive performance revealed NiO nanoflakes grown on nickel foam might be promising supercapacitor electrode materials for future energy storage applications.

  7. Facile synthesis and electron transport properties of NiO nanostructures investigated by scanning tunneling microscopy

    NASA Astrophysics Data System (ADS)

    Mallick, Govind; Labh, Jyotsna; Giri, Lily; Pandey, Avinash C.; Karna, Shashi P.

    2017-08-01

    Due to their unique chemical, thermal, electronic and photonic properties, low -dimensional transition metal oxides, especially NiO, have attracted great deal of attention for potential applications in a wide range of technologies, such as, sensors, electrochromic coatings and self-healing materials. However, their synthesis involves multi-step complex procedures that in addition to being expensive, further introduce impurities. Here we present a low cost facile approach to synthesize uniform size NiO nanoparticles (NPs) from hydrothermally grown Ni(OH)2. Detailed transmission electron microscopic analysis reveal the average size of NiO NPs to be around 29 nm. The dimension of NiO NP is also corroborated by the small area scanning tunneling microscope (STM) measurements. Further, we investigate electron transport characteristics of newly synthesized Ni(OH)2 and NiO nanoparticles on p-type Si substrate using scanning tunneling microscopy. The conductivity of Ni(OH)2 and NiO are determined to be 1.46x10-3 S/cm and 2.37x10-5 S/cm, respectively. The NiO NPs exhibit a lower voltage window (˜0.7 V) electron tunneling than the parent Ni(OH)2.

  8. The influence of Er3+ doping on the structural and optical properties of CeO2 thin films grown by PED

    NASA Astrophysics Data System (ADS)

    Tatar, B.; Gökdemir, F. P.; Pehlivan, E.; Urgen, M.

    2013-11-01

    Erbium doped CeO2 thin films were deposited on both Corning glass substrates and indium doped tin oxide (ITO) coated glass substrates by pulsed e-beam deposition (PED) method at room temperature. Structural features of Er doped CeO2 thin films were studied with X-ray diffraction (XRD) and micro-Raman spectra. The XRD patterns of all films showed polycrystalline nature and cubic crystalline structure. Raman active peaks for both undoped CeO2 and Er doped CeO2 films were determined at ˜465 cm-1. The Raman shift observed in this study can also be assigned to Raman active modes of CeO2 that are shifted from the original position due to different doping concentration. The optical properties of CeO2 films and Er doped CeO2 films, which were determined from transmittance and reflectance measurements at room temperature, were very similar in character. The refractive indices and extinction coefficients, which were calculated from 3.5 to 1.25 eV (300-1000 nm), were between 1.5-3 and 0.05-0.2, respectively. The optical band gaps were deduced from the absorption coefficient according to solid band theory. The electrochromic measurements revealed that 2% Er doped CeO2 films grown on ITO + WO3 substrates had highest charge density compared to the other samples. Long-time cyclic voltammetry (CV) and chronoamperometry (CA) measurements were carried out to investigate the stability of this film.

  9. Spectroscopic and microscopic studies of self-assembled nc-Si/a-SiC thin films grown by low pressure high density spontaneous plasma processing.

    PubMed

    Das, Debajyoti; Kar, Debjit

    2014-12-14

    In view of suitable applications in the window layer of nc-Si p-i-n solar cells in superstrate configuration, the growth of nc-Si/a-SiC composite films was studied, considering the trade-off relation between individual characteristics of its a-SiC component to provide a wide optical-gap and electrically conducting nc-Si component to simultaneously retain enough crystalline linkages to facilitate proper crystallization to the i-nc-Si absorber-layer during its subsequent growth. Self-assembled nc-Si/a-SiC thin films were spontaneously grown by low-pressure planar inductively coupled plasma CVD, operating in electromagnetic mode, providing high atomic-H density. Spectroscopic simulations of ellipsometry and Raman data, and systematic chemical and structural analysis by XPS, TEM, SEM and AFM were performed. Corresponding to optimized inclusion of C essentially incorporated as Si-C bonds in the network, the optical-gap of the a-SiC component widened, void fraction including the incubation layer thickness reduced. While the bulk crystallinity decreased only marginally, Si-ncs diminished in size with narrower distribution and increased number density. With enhanced C-incorporation, formation of C-C bonds in abundance deteriorates the Si continuous bonding network and persuades growth of an amorphous dominated silicon-carbon heterostructure containing high-density tiny Si-ncs. Stimulated nanocrystallization identified in the Si-network, induced by a limited amount of carbon incorporation, makes the material most suitable for applications in nc-Si solar cells. The novelty of the present work is to enable spontaneous growth of self-assembled superior quality nc-Si/a-SiC thin films and simultaneous spectroscopic simulation-based optimization of properties for utilization in devices.

  10. UV light induced insulator-metal transition in ultra-thin ZnO/TiOx stacked layer grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Saha, D.; Misra, P.; Joshi, M. P.; Kukreja, L. M.

    2016-08-01

    In the present study, atomic layer deposition has been used to grow a series of Ti incorporated ZnO thin films by vertically stacking different numbers (n = 1-7) of ZnO/TiOx layers on (0001) sapphire substrates. The effects of defect states mediated chemisorption of O2 and/OH groups on the electrical properties of these films have been investigated by illuminating the samples under UV light inside a high vacuum optical cryostat. The ultra-thin film having one stacked layer (n = 1) did not show any change in its electrical resistance upon UV light exposure. On the contrary, marginal drop in the electrical resistivity was measured for the samples with n ≥ 3. Most surprisingly, the sample with n = 2 (thickness ˜ 12 nm) showed an insulator to metal transition upon UV light exposure. The temperature dependent electrical resistivity measurement on the as grown film (n = 2) showed insulating behaviour, i.e., diverging resistivity on extrapolation to T→ 0 K. However, upon UV light exposure, it transformed to a metallic state, i.e., finite resistivity at T → 0 K. Such an insulator-metal transition plausibly arises due to the de-trapping of conduction electrons from the surface defect sites which resulted in an upward shift of the Fermi level above the mobility edge. The low-temperature electron transport properties on the insulating film (n = 2) were investigated by a combined study of zero field electrical resistivity ρ(T) and magnetoresistance (MR) measurements. The observed negative MR was found to be in good agreement with the magnetic field induced suppression of quantum interference between forward-going paths of tunnelling electrons. Both ρ(T) and MR measurements provided strong evidence for the Efros-Shklovskii type variable range hopping conduction in the low-temperature (≤40 K) regime. Such studies on electron transport in ultra-thin n-type doped ZnO films are crucial to achieve optimum functionality with long term reliability of ZnO based transparent

  11. UV light induced insulator-metal transition in ultra-thin ZnO/TiO{sub x} stacked layer grown by atomic layer deposition

    SciTech Connect

    Saha, D. E-mail: pmisra@rrcat.gov.in; Misra, P. E-mail: pmisra@rrcat.gov.in; Joshi, M. P.; Kukreja, L. M.

    2016-08-28

    In the present study, atomic layer deposition has been used to grow a series of Ti incorporated ZnO thin films by vertically stacking different numbers (n = 1–7) of ZnO/TiO{sub x} layers on (0001) sapphire substrates. The effects of defect states mediated chemisorption of O{sub 2} and/OH groups on the electrical properties of these films have been investigated by illuminating the samples under UV light inside a high vacuum optical cryostat. The ultra-thin film having one stacked layer (n = 1) did not show any change in its electrical resistance upon UV light exposure. On the contrary, marginal drop in the electrical resistivity was measured for the samples with n ≥ 3. Most surprisingly, the sample with n = 2 (thickness ∼ 12 nm) showed an insulator to metal transition upon UV light exposure. The temperature dependent electrical resistivity measurement on the as grown film (n = 2) showed insulating behaviour, i.e., diverging resistivity on extrapolation to T→ 0 K. However, upon UV light exposure, it transformed to a metallic state, i.e., finite resistivity at T → 0 K. Such an insulator-metal transition plausibly arises due to the de-trapping of conduction electrons from the surface defect sites which resulted in an upward shift of the Fermi level above the mobility edge. The low-temperature electron transport properties on the insulating film (n = 2) were investigated by a combined study of zero field electrical resistivity ρ(T) and magnetoresistance (MR) measurements. The observed negative MR was found to be in good agreement with the magnetic field induced suppression of quantum interference between forward-going paths of tunnelling electrons. Both ρ(T) and MR measurements provided strong evidence for the Efros-Shklovskii type variable range hopping conduction in the low-temperature (≤40 K) regime. Such studies on electron transport in ultra-thin n-type doped ZnO films are crucial to achieve optimum functionality

  12. Wavelength tunable photoluminescence of ZnO{sub 1-x}S{sub x} alloy thin films grown by reactive sputtering

    SciTech Connect

    Xu, Hongbin; Zhu, Liping; Jiang, Jie; Cai, Hui; Chen, Wenfeng; Hu, Liang; Guo, Yanmin; Ye, Zhizhen

    2013-08-28

    ZnO{sub 1−x}S{sub x} alloy thin films with various S contents were deposited on glass substrates by reactive sputtering. The films were grown in high crystalline quality and strong preferential crystallographic orientation. Variations of the lattice constant c followed Vegard's law. X-ray photoelectron spectroscopy confirmed the substitution of O by S in ZnO. The composition dependence of the band gap energy in ZnO{sub 1−x}S{sub x} system was investigated and the band gap bowing parameter was estimated to be about 1.46 eV. The incorporation of S led to the expected redshift of the band gap related photoluminescence emission of ZnO{sub 1−x}S{sub x} films up to 320 meV. The results indicate that ZnO{sub 1−x}S{sub x} films could hold the prospect for the development of ZnO based quantum structures.

  13. Characterization of structural defects in SnSe2 thin films grown by molecular beam epitaxy on GaAs (111)B substrates

    NASA Astrophysics Data System (ADS)

    Tracy, Brian D.; Li, Xiang; Liu, Xinyu; Furdyna, Jacek; Dobrowolska, Margaret; Smith, David J.

    2016-11-01

    Tin selenide thin films have been grown by molecular beam epitaxy on GaAs (111)B substrates at a growth temperature of 150 °C, and a microstructural study has been carried out, primarily using the technique of transmission electron microscopy. The Se:Sn flux ratio during growth was systematically varied and found to have a strong impact on the resultant crystal structure and quality. Low flux ratios (Se:Sn=3:1) led to defective films consisting primarily of SnSe, whereas high flux ratios (Se:Sn>10:1) gave higher quality, single-phase SnSe2. The structure of the monoselenide films was found to be consistent with the Space Group Pnma with the epitaxial growth relationship of [011]SnSe// [ 1 1 bar 0 ] GaAs, while the diselenide films were consistent with the Space Group P 3 bar m1 , and had the epitaxial growth relationship [ 2 1 bar 1 bar 0 ]SnSe2// [ 1 1 bar 0 ] GaAs.

  14. Observation of dopant-profile independent electron transport in sub-monolayer TiO{sub x} stacked ZnO thin films grown by atomic layer deposition

    SciTech Connect

    Saha, D. E-mail: pmisra@rrcat.gov.in; Misra, P. E-mail: pmisra@rrcat.gov.in; Joshi, M. P.; Kukreja, L. M.; Das, Gangadhar

    2016-01-18

    Dopant-profile independent electron transport has been observed through a combined study of temperature dependent electrical resistivity and magnetoresistance measurements on a series of Ti incorporated ZnO thin films with varying degree of static-disorder. These films were grown by atomic layer deposition through in-situ vertical stacking of multiple sub-monolayers of TiO{sub x} in ZnO. Upon decreasing ZnO spacer layer thickness, electron transport smoothly evolved from a good metallic to an incipient non-metallic regime due to the intricate interplay of screening of spatial potential fluctuations and strength of static-disorder in the films. Temperature dependent phase-coherence length as extracted from the magnetotransport measurement revealed insignificant role of inter sub-monolayer scattering as an additional channel for electron dephasing, indicating that films were homogeneously disordered three-dimensional electronic systems irrespective of their dopant-profiles. Results of this study are worthy enough for both fundamental physics perspective and efficient applications of multi-stacked ZnO/TiO{sub x} structures in the emerging field of transparent oxide electronics.

  15. TiO2 thin and thick films grown on Si/glass by sputtering of titanium targets in an RF inductively coupled plasma

    NASA Astrophysics Data System (ADS)

    Valencia-Alvarado, R.; de la Piedad-Beneitez, A.; López-Callejas, R.; Mercado-Cabrera, A.; Peña-Eguiluz, R.; Muñoz-Castro, A. E.; Rodríguez-Méndez, B. G.; de la Rosa-Vázquez, J. M.

    2015-03-01

    TiO2 thin and thick films were deposited on silicon/glass substrates using RF inductive plasma in continuous wave. The films thickness, as well as phases control, is achieved with a gradual increase in temperature substrates varying supplied RF power or working gas pressure besides deposition time as well. The deposition conditions were: argon 80%/oxygen 20% carefully calibrated mixture of 2 to 7×10-2 mbar as working gas pressure range. Deposition time 0.5 to 5 hours, 500 or 600 W RF power at 13.56 MHz frequency and 242-345 °C substrates temperature range. The titanium dioxide deposited on the substrates is grown by sputtering of a titanium target negatively polarized at 3-5 kV DC situated 14 mm in front of such substrates. The plasma reactor is a simple Pyrex-like glass cylindrical vessel of 50 cm long and 20 cm in diameter. Using the before describe plasma parameters we obtained films only anatase and both anatase/rutile phases with stoichiometric different. The films were characterized by X-ray photoelectron spectroscopy (XPS), stylus profilometer, X-ray diffraction (XRD), scanning electron microscopy (SEM) and Raman spectroscopy.

  16. Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition.

    PubMed

    Wu, Jingjin; Zhao, Yinchao; Zhao, Ce Zhou; Yang, Li; Lu, Qifeng; Zhang, Qian; Smith, Jeremy; Zhao, Yongming

    2016-08-13

    The 4 at. % zirconium-doped zinc oxide (ZnO:Zr) films grown by atomic layer deposition (ALD) were annealed at various temperatures ranging from 350 to 950 °C. The structural, electrical, and optical properties of rapid thermal annealing (RTA) treated ZnO:Zr films have been evaluated to find out the stability limit. It was found that the grain size increased at 350 °C and decreased between 350 and 850 °C, while creeping up again at 850 °C. UV-vis characterization shows that the optical band gap shifts towards larger wavelengths. The Hall measurement shows that the resistivity almost keeps constant at low annealing temperatures, and increases rapidly after treatment at 750 °C due to the effect of both the carrier concentration and the Hall mobility. The best annealing temperature is found in the range of 350-550 °C. The ZnO:Zr film-coated glass substrates show good optical and electrical performance up to 550 °C during superstrate thin film solar cell deposition.

  17. Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition

    PubMed Central

    Wu, Jingjin; Zhao, Yinchao; Zhao, Ce Zhou; Yang, Li; Lu, Qifeng; Zhang, Qian; Smith, Jeremy; Zhao, Yongming

    2016-01-01

    The 4 at. % zirconium-doped zinc oxide (ZnO:Zr) films grown by atomic layer deposition (ALD) were annealed at various temperatures ranging from 350 to 950 °C. The structural, electrical, and optical properties of rapid thermal annealing (RTA) treated ZnO:Zr films have been evaluated to find out the stability limit. It was found that the grain size increased at 350 °C and decreased between 350 and 850 °C, while creeping up again at 850 °C. UV–vis characterization shows that the optical band gap shifts towards larger wavelengths. The Hall measurement shows that the resistivity almost keeps constant at low annealing temperatures, and increases rapidly after treatment at 750 °C due to the effect of both the carrier concentration and the Hall mobility. The best annealing temperature is found in the range of 350–550 °C. The ZnO:Zr film-coated glass substrates show good optical and electrical performance up to 550 °C during superstrate thin film solar cell deposition. PMID:28773816

  18. Three-dimensional Monte Carlo simulation of nanorod self-organization in REBa2Cu3O y thin films grown by vapor phase epitaxy

    NASA Astrophysics Data System (ADS)

    Ichino, Yusuke; Yoshida, Yutaka; Miura, Shun

    2017-01-01

    Some metal-complex oxides (MCOs) self-organize within REBa2Cu3O y (REBCO: RE = rare earth) superconducting thin films grown by vapor phase epitaxy. To clarify the self-organization mechanism, we developed a three-dimensional Monte Carlo (3D-MC) simulation code using a simple model and simulated nanorod growth under various growth conditions. As a result, the self-organization of nanorods was reproduced by 3D-MC simulations and we clarified the nanorod growth mechanism as follows. The growth mode of MCO particles was 3D island growth due to the instability of the interface of the MCO and the substrate. On the other hand, that of REBCO particles was 2D island growth. There were diverse nanostructures, which were strongly affected by substrate temperature (T s) and deposition rate (v dep). We constructed a contour plot of the nanorod number density and a phase diagram of the nanostructures depending on T s and v dep.

  19. Magnetic and transport properties of epitaxial thin film MgFe2O4 grown on MgO (100) by molecular beam epitaxy

    PubMed Central

    Wu, Han-Chun; Mauit, Ozhet; Coileáin, Cormac Ó; Syrlybekov, Askar; Khalid, Abbas; Mouti, Anas; Abid, Mourad; Zhang, Hong-Zhou; Abid, Mohamed; Shvets, Igor V.

    2014-01-01

    Magnesium ferrite is a very important magnetic material due to its interesting magnetic and electrical properties and its chemical and thermal stability. Here we report on the magnetic and transport properties of epitaxial MgFe2O4 thin films grown on MgO (001) by molecular beam epitaxy. The structural properties and chemical composition of the MgFe2O4 films were characterized by X-Ray diffraction and X-Ray photoelectron spectroscopy, respectively. The nonsaturation of the magnetization in high magnetic fields observed for M (H) measurements and the linear negative magnetoresistance (MR) curves indicate the presence of anti-phase boundaries (APBs) in MgFe2O4. The presence of APBs was confirmed by transmission electron microscopy. Moreover, post annealing decreases the resistance and enhances the MR of the film, suggesting migration of the APBs. Our results may be valuable for the application of MgFe2O4 in spintronics. PMID:25388355

  20. Pressure effect on the magnetization of Sr{sub 2}FeMoO{sub 6} thin films grown by pulsed laser deposition

    SciTech Connect

    Fix, T.; Versini, G.; Loison, J.L.; Colis, S.; Schmerber, G.; Pourroy, G.; Dinia, A.

    2005-01-15

    Thin films of Sr{sub 2}FeMoO{sub 6} (SFMO) are grown on SrTiO{sub 3} (001) substrates by pulsed laser deposition. The best films provide 3.2{mu}{sub B}/f.u. at 5 K, a Curie temperature above 400 K, low roughness, high crystallinity, and low splashing. Therefore, the use of such SFMO electrodes in magnetic tunnel junctions patterned with conventional lithography is promising. Pseudomorphic epitaxial growth is obtained for thicknesses under 50 nm. Above this thickness the films do not relax homogeneously. A coherent and systematic variation of the magnetization with the deposition conditions is obtained, which highlights a high reproducibility. Under a reasonable O{sub 2} partial pressure to avoid parasite phases, the limiting factor for high magnetization is the total pressure or the deposition rate. Therefore, the deposition rate is suspected to have a strong influence on the Fe/Mo ordering. Highly magnetic samples are obtained under a low gas flow of either a 20% O{sub 2}+N{sub 2} or a 0.3% O{sub 2}+Ar.

  1. Surface phonons of thin GaSe and InSe films epitaxially grown on the Si(111)(1×1)-H surface

    NASA Astrophysics Data System (ADS)

    Panella, V.; Glebov, A. L.; Toennies, J. P.; Sébenne, C.; Eckl, C.; Adler, C.; Pavone, P.; Schröder, U.

    1999-06-01

    Surface-phonon-dispersion curves of the (001) surfaces of the GaSe and InSe films epitaxially grown on the hydrogen-terminated Si(111)(1×1) surface have been investigated by high-resolution inelastic helium-atom scattering. The phonon-dispersion curves of the GaSe(001) thin epitaxial films are very similar to those of the single crystals investigated previously. For comparison with the experiments, density-functional theory based on the plane-wave pseudopotential method has been used to determine the phonon-dispersion curves of bulk GaSe and InSe in a consistent formalism. No difference is found between the surface and bulk phonons of these two layered compounds, as expected due to weak interlayer interaction forces. The high quality of the time-of-flight spectra presented here together with the ab initio calculations provide insight into the phonon dynamics of GaSe(001), and a characterization of the phonon modes of InSe(001).

  2. Comparison of heterojunction device parameters for pure and doped ZnO thin films with IIIA (Al or In) elements grown on silicon at room ambient

    NASA Astrophysics Data System (ADS)

    Kaya, Ahmet; Cansizoglu, Hilal; Mamtaz, Hasina H.; Mayet, Ahmed S.; Islam, M. Saif

    2016-09-01

    In this work, pure and IIIA element doped ZnO thin films were grown on p type silicon (Si) with (100) orientated surface by sol-gel method, and were characterized for comparing their electrical characteristics. The heterojunction parameters were obtained from the current-voltage (I-V) and capacitance-voltage (C-V) characteristics at room temperature. The ideality factor (n), saturation current (Io) and junction resistance of ZnO/p-Si heterojunction for both pure and doped (with Al or In) cases were determined by using different methods at room ambient. Other electrical parameters such as Fermi energy level (EF), barrier height (ΦB), acceptor concentration (Na), built-in potential (Φi) and voltage dependence of surface states (Nss) profile were obtained from the C-V measurements. The results reveal that doping ZnO with IIIA (Al or In) elements to fabricate n-ZnO/p-Si heterojunction can result in high performance diode characteristics.

  3. Structural properties of Bi{sub 2−x}Mn{sub x}Se{sub 3} thin films grown via molecular beam epitaxy

    SciTech Connect

    Babakiray, Sercan; Johnson, Trent A.; Borisov, Pavel; Holcomb, Mikel B.; Lederman, David; Marcus, Matthew A.; Tarafder, Kartick

    2015-07-28

    The effects of Mn doping on the structural properties of the topological insulator Bi{sub 2}Se{sub 3} in thin film form were studied in samples grown via molecular beam epitaxy. Extended x-ray absorption fine structure measurements, supported by density functional theory calculations, indicate that preferential incorporation occurs substitutionally in Bi sites across the entire film volume. This finding is consistent with x-ray diffraction measurements which show that the out of plane lattice constant expands while the in plane lattice constant contracts as the Mn concentration is increased. X-ray photoelectron spectroscopy indicates that the Mn valency is 2+ and that the Mn bonding is similar to that in MnSe. The expansion along the out of plane direction is most likely due to weakening of the Van der Waals interactions between adjacent Se planes. Transport measurements are consistent with this Mn{sup 2+} substitution of Bi sites if additional structural defects induced by this substitution are taken into account.

  4. Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H-SiC by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Tian, Li-Xin; Zhang, Feng; Shen, Zhan-Wei; Yan, Guo-Guo; Liu, Xing-Fang; Zhao, Wan-Shun; Wang, Lei; Sun, Guo-Sheng; Zeng, Yi-Ping

    2016-12-01

    Annealing effects on structural and compositional performances of Al2O3 thin films on 4H-SiC substrates are studied comprehensively. The Al2O3 films are grown by atomic layer deposition through using trimethylaluminum and H2O as precursors at 300 °C, and annealed at various temperatures in ambient N2 for 1 min. The Al2O3 film transits from amorphous phase to crystalline phase as annealing temperature increases from 750 °C to 768 °C. The refractive index increases with annealing temperature rising, which indicates that densification occurs during annealing. The densification and grain formation of the film upon annealing are due to crystallization which is relative with second-nearest-neighbor coordination variation according to the x-ray photoelectron spectroscopy (XPS). Although the binding energies of Al 2p and O 1s increase together during crystallization, separations between Al 2p and O 1s are identical between as-deposited and annealed sample, which suggests that the nearest-neighbour coordination is similar. Project supported by the National Basic Research Program of China (Grant No. 2015CB759600), the National Natural Science Foundation of China (Grant Nos. 61474113, 61574140, and 61274007), and the Beijing Nova Program, China (Grant No. xx2016071), and the CAEP Microsystem and THz Science and Technology Foundation (Grant No. CAEPMT201502).

  5. Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan; Kizir, Seda; Haider, Ali; Biyikli, Necmi

    2016-07-01

    In this study, aluminum nitride (AlN) thin films were deposited at 200 °C, on p-type silicon substrates utilizing a capacitively coupled hollow-cathode plasma source integrated atomic layer deposition (ALD) reactor. The structural properties of AlN were characterized by grazing incidence x-ray diffraction, by which we confirmed the hexagonal wurtzite single-phase crystalline structure. The films exhibited an optical band edge around ˜5.7 eV. The refractive index and extinction coefficient of the AlN films were measured via a spectroscopic ellipsometer. In addition, to investigate the electrical conduction mechanisms and dielectric properties, Al/AlN/p-Si metal-insulator-semiconductor capacitor structures were fabricated, and current density-voltage and frequency dependent (7 kHz-5 MHz) dielectric constant measurements (within the strong accumulation region) were performed. A peak of dielectric loss was observed at a frequency of 3 MHz and the Cole-Davidson empirical formula was used to determine the relaxation time. It was concluded that the native point defects such as nitrogen vacancies and DX centers formed with the involvement of Si atoms into the AlN layers might have influenced the electrical conduction and dielectric relaxation properties of the plasma-assisted ALD grown AlN films.

  6. Microstructure and dielectric properties of (Ba 0.6Sr 0.4)TiO 3 thin films grown on super smooth glazed-Al 2O 3 ceramics substrate

    NASA Astrophysics Data System (ADS)

    Chen, Hongwei; Yang, Chuanren; Zheng, Shanxue; Zhang, Jihua; Zhang, Qiaozhen; Lei, Guanhuan; Lou, Feizhi; Yang, Lijun

    2011-12-01

    Modified substrates with nanometer scale smooth surface were obtained via coating a layer of CaO-Al2O3-SiO2 (CaAlSi) high temperature glaze with proper additives on the rough-95% Al2O3 ceramics substrates. (Ba0.6Sr0.4)TiO3 (BST) thin films were deposited on modified Al2O3 substrates by radio-frequency magnetron sputtering. The microstructure, dielectric, and insulating properties of BST thin films grown on glazed-Al2O3 substrates were investigated by X-ray diffraction (XRD), atomic force microscope (AFM), and dielectric properties measurement. These results showed that microstructure and dielectric properties of BST thin films grown on glazed-Al2O3 substrates were almost consistent with that of BST thin films grown on LaAlO3 (1 0 0) single-crystal substrates. Thus, the expensive single-crystal substrates may be substituted by extremely cheap glazed-Al2O3 substrates.

  7. Atomic disorder of Li0.5Ni0.5O thin films caused by Li doping: estimation from X-ray Debye–Waller factors

    PubMed Central

    Yang, Anli; Sakata, Osami; Yamauchi, Ryosuke; Kumara, L. S. R.; Song, Chulho; Katsuya, Yoshio; Matsuda, Akifumi; Yoshimoto, Mamoru

    2015-01-01

    Cubic type room-temperature (RT) epitaxial Li0.5Ni0.5O and NiO thin films with [111] orientation grown on ultra-smooth sapphire (0001) substrates were examined using synchrotron-based thin-film X-ray diffraction. The 11 and 22 rocking curves including six respective equivalent reflections of the Li0.5Ni0.5O and NiO thin films were recorded. The RT B 1 factor, which appears in the Debye–Waller factor, of a cubic Li0.5Ni0.5O thin film was estimated to be 1.8 (4) Å2 from its 11 and 22 reflections, even though the Debye model was originally derived on the basis of one cubic element. The corresponding Debye temperature is 281 (39) K. Furthermore, the B 2 factor in the pseudo-Debye–Waller factor is proposed. This parameter, which is evaluated using one reflection, was also determined for the Li0.5Ni0.5O thin film by treating Li0.5Ni0.5O and NiO as ideal NaCl crystal structures. A structural parameter for the atomic disorder is introduced and evaluated. This parameter includes the combined effects of thermal vibration, interstitial atoms and defects caused by Li doping using the two Debye–Waller factors. PMID:26664345

  8. Magnetic and structural properties of BiFeO{sub 3} thin films grown epitaxially on SrTiO{sub 3}/Si substrates

    SciTech Connect

    Laughlin, Ryan P.; Currie, Daniel A.; Contreras-Guererro, Rocio; Dedigama, Aruna; Priyantha, Weerasinghe; Droopad, Ravindranath; Theodoropoulou, Nikoleta; Gao Peng; Pan Xiaoqing

    2013-05-07

    The integration of oxides with semiconductors is important for the technological advancement of the next generation electronics. Concomitant ferroelectric and antiferromagnetic (AF) behavior is demonstrated in single crystal BiFeO{sub 3} (BFO) films grown on 20 nm SrTiO{sub 3} (STO) virtual substrates on Si(100) using molecular beam epitaxy (MBE). STO thin films are grown in an oxide MBE chamber by co-deposition of Sr, Ti, and molecular O{sub 2}. Careful control of the O{sub 2} during nucleation produced commensurate growth of STO on Si. The sequence of the steps allows for the suppression of an amorphous SiO{sub 2} layer. This STO(20 nm)/Si structure was used as a virtual substrate for MBE deposition of BFO on Si without breaking vacuum. BFO was deposited using Fe and O{sub 2} plasma with an overpressure of Bi flux, the growth rate was controlled by the incoming Fe flux. The reflection high energy electron diffraction image shows a 2-D growth front with a 6-fold surface reconstruction under optimized O{sub 2} pressure of 5 Multiplication-Sign 10{sup -8} mbar. Cross-sectional transmission electron microscopy (TEM) confirms the high crystallinity of the films and shows sharp, atomically flat interfaces. The selected area diffraction pattern (SADP) reveals that BFO grows in a distorted rhombohedral crystal structure. X-ray diffraction does not show formation of second phases and is consistent with the TEM and SADP results. The BFO films show AF behavior with a Neel temperature that exceeds 350 K, as expected (T{sub N} = 673 K) and with a residual ferromagnetic behavior that decreases with film thickness and is consistent with the G-type AF due to the canted spins. The saturation magnetization per unit volume for a 40 nm thick film was 180 emu/cm{sup 3} at an in-plane magnetic field of 8 kOe. The ferroelectric behavior of the films was verified using piezoresponse force microscopy.

  9. High-quality AlGaN/GaN grown on sapphire by gas-source molecular beam epitaxy using a thin low-temperature AlN layer

    SciTech Connect

    Jurkovic, M.J.; Li, L.K.; Turk, B.; Wang, W.I.; Syed, S.; Simonian, D.; Stormer, H.L.

    2000-07-01

    Growth of high-quality AlGaN/GaN heterostructures on sapphire by ammonia gas-source molecular beam epitaxy is reported. Incorporation of a thin AlN layer grown at low temperature within the GaN buffer is shown to result in enhanced electrical and structural characteristics for subsequently grown heterostructures. AlGaN/GaN structures exhibiting reduced background doping and enhanced Hall mobilities (2100, 10310 and 12200 cm{sup 2}/Vs with carrier sheet densities of 6.1 x 10{sup 12} cm{sup {minus}2}, and 5.8 x 10{sup 12} cm{sup {minus}2} at 300 K, 77 K, and 0.3 K, respectively) correlate with dislocation filtering in the thin AlN layer. Magnetotransport measurements at 0.3 K reveal well-resolved Shubnikov-de Haas oscillations starting at 3 T.

  10. Temperature-induced changes in optical properties of thin film TiO2-Al2O3 bi-layer structures grown by atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Ali, Rizwan; Saleem, Muhammad Rizwan; Honkanen, Seppo

    2016-02-01

    We investigate the optical properties and corresponding temperature-induced changes in highly uniform thin amorphous films and their bi-layer stacks grown by Atomic Layer Deposition (ALD). The environmentally driven conditions such as temperature, humidity and pressure have a significant influence on optical properties of homogeneous and heterogeneous bi-layer stacked structures of TiO2-Al2O3 and subsequently affect the specific sensitive nature of optical signals from nano-optical devices. Owing to the super hydrophilic behavior and inhibited surface defects in the form of hydrogenated species, the thermo-optic coefficient (TOC) of ~ 100 nm thick ALD-TiO2 films vary significantly with temperature, which can be used for sensing applications. On the other hand, the TOC of ~ 100 nm thick ALD-Al2O3 amorphous films show a differing behavior with temperature. In this work, we report on reduction of surface defects in ALD-TiO2 films by depositing a number of ultra-thin ALD-Al2O3 films to act as impermeable barrier layers. The designed and fabricated heterostructures of ALD-TiO2/Al2O3 films with varying ALD-Al2O3 thicknesses are exploited to stabilize the central resonance peak of Resonant Waveguide Gratings (RWGs) in thermal environments. The temperature-dependent optical constants of ALD-TiO2/Al2O3 bi-layer films are measured by a variable angle spectroscopic ellipsometer (VASE), covering a wide spectral range 380 <= λ <= 1800 nm at a temperature range from 25 to 105 °C. The Cauchy model is used to design and retrieve refractive indices at these temperatures, measured with three angles of incidence (59°, 67°, and 75°). The optical constants of 100 nm thick ALD-TiO2 and various combinational thicknesses of ALD-Al2O3 films are used to predict TOCs using a polynomial fitting algorithm.

  11. Sb[subscript 2]Te[subscript 3] and Bi[subscript 2]Te[subscript 3] Thin Films Grown by Room-Temperature MBE

    SciTech Connect

    Aabdin, Z.; Peranio, N.; Winkler, M.; Bessas, D.; König, J.; Hermann, R.P.; Böttner, H.; Eibl, O.

    2012-10-23

    Sb{sub 2}Te3 and Bi{sub 2}Te3 thin films were grown on SiO{sub 2} and BaF{sub 2} substrates at room temperature using molecular beam epitaxy. Metallic layers with thicknesses of 0.2 nm were alternately deposited at room temperature, and the films were subsequently annealed at 250 C for 2 h. x-Ray diffraction and energy-filtered transmission electron microscopy (TEM) combined with high-accuracy energy-dispersive x-ray spectrometry revealed stoichiometric films, grain sizes of less than 500 nm, and a texture. High-quality in-plane thermoelectric properties were obtained for Sb{sub 2}Te3 films at room temperature, i.e., low charge carrier density (2.6 x 10{sup 19} cm{sup -3}, large thermopower (130 {micro}V K{sup -1}), large charge carrier mobility (402 cm{sup 2} V{sup -1} s{sup -1}), and resulting large power factor (29 {micro}W cm{sup -1} K{sup -2}). Bi{sub 2}Te3 films also showed low charge carrier density (2.7 x 10{sup 19} cm{sup -3}), moderate thermopower (-153 {micro}V K{sup -1}), but very low charge carrier mobility (80 cm{sup 2} V{sup -1} s{sup -1}), yielding low power factor (8 {micro}W cm{sup -1} K{sup -2}). The low mobilities were attributed to Bi-rich grain boundary phases identified by analytical energy-filtered TEM.

  12. Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor

    NASA Astrophysics Data System (ADS)

    Niinistö, J.; Putkonen, M.; Niinistö, L.; Kukli, K.; Ritala, M.; Leskelä, M.

    2004-01-01

    ZrO2 thin films with thicknesses below 20 nm were deposited by the atomic layer deposition process on Si(100) substrates at 350 °C. An organometallic precursor, Cp2Zr(CH3)2 (Cp=cyclopentadienyl, C5H5) was used as the zirconium source and water or ozone as oxygen source. The influence of oxygen source and substrate pretreatment on the dielectric properties of ZrO2 films was investigated. Structural characterization with high-resolution transmission electron microscopy was performed to films grown onto HF-etched or native oxide covered silicon. Strong inhibition of ZrO2 film growth was observed with the water process on HF-etched Si. Ozone process on HF-etched Si resulted in interfacial SiO2 formation between the dense and uniform film and the substrate while water process produced interfacial layer with intermixing of SiO2 and ZrO2. The effective permittivity of ZrO2 in Al/ZrO2/Si/Al capacitor structures was dependent on the ZrO2 layer thickness and oxygen source used. The interfacial layer formation increased the capacitance equivalent oxide thickness (CET). CET of 2.0 nm was achieved with 5.9 nm ZrO2 film deposited with the H2O process on HF-stripped Si. The ozone-processed films showed good dielectric properties such as low hysteresis and nearly ideal flatband voltage. The leakage current density was lower and breakdown field higher for the ozone-processed ZrO2 films.

  13. Highly textured Sr, Nb co-doped BiFeO{sub 3} thin films grown on SrRuO{sub 3}/Si substrates by rf- sputtering

    SciTech Connect

    Ostos, C.; Raymond, O.; Siqueiros, J. M.; Suarez-Almodovar, N.; Bueno-Baques, D.; Mestres, L.

    2011-07-15

    In this study, (011)-highly oriented Sr, Nb co-doped BiFeO{sub 3} (BFO) thin films were successfully grown on SrRuO{sub 3}/Si substrates by rf-magnetron sputtering. The presence of parasite magnetic phases was ruled out based on the high resolution x-ray diffraction data. BFO films exhibited a columnar-like grain growth with rms surface roughness values of {approx_equal}5.3 nm and average grain sizes of {approx_equal}65-70 nm for samples with different thicknesses. Remanent polarization values (2P{sub r}) of 54 {mu}C cm{sup -2} at room temperature were found for the BFO films with a ferroelectric behavior characteristic of an asymmetric device structure. Analysis of the leakage mechanisms for this structure in negative bias suggests Schottky injection and a dominant Poole-Frenkel trap-limited conduction at room temperature. Oxygen vacancies and Fe{sup 3+}/Fe{sup 2+} trap centers are consistent with the surface chemical bonding states analysis from x-ray photoelectron spectroscopy data. The (011)-BFO/SrRuO{sub 3}/Si film structure exhibits a strong magnetic interaction at the interface between the multiferroic film and the substrate layer where an enhanced ferromagnetic response at 5 K was observed. Zero-field cooled (ZFC) and field cooled (FC) magnetization curves of this film system revealed a possible spin glass behavior at spin freezing temperatures below 30 K depending on the BFO film thickness.

  14. Highly transparent and reproducible nanocrystalline ZnO and AZO thin films grown by room temperature pulsed-laser deposition on flexible Zeonor plastic substrates

    NASA Astrophysics Data System (ADS)

    Inguva, Saikumar; Vijayaraghavan, Rajani K.; McGlynn, Enda; Mosnier, Jean-Paul

    2015-09-01

    Zeonor plastics are highly versatile due to exceptional optical and mechanical properties which make them the choice material in many novel applications. For potential use in flexible transparent optoelectronic applications, we have investigated Zeonor plastics as flexible substrates for the deposition of highly transparent ZnO and AZO thin films. Films were prepared by pulsed laser deposition at room temperature in oxygen ambient pressures of 75, 150 and 300 mTorr. The growth rate, surface morphology, hydrophobicity and the structural, optical and electrical properties of as-grown films with thicknesses ˜65-420 nm were recorded for the three oxygen pressures. The growth rates were found to be highly linear both as a function of film thickness and oxygen pressure, indicating high reproducibility. All the films were optically smooth, hydrophobic and nanostructured with lateral grain shapes of ˜150 nm wide. This was found compatible with the deposition of condensed nanoclusters, formed in the ablation plume, on a cold and amorphous substrate. Films were nanocrystalline (wurtzite structure), c-axis oriented, with average crystallite size ˜22 nm for ZnO and ˜16 nm for AZO. In-plane compressive stress values of 2-3 GPa for ZnO films and 0.5 GPa for AZO films were found. Films also displayed high transmission greater than 95% in some cases, in the 400-800 nm wavelength range. The low temperature photoluminescence spectra of all the ZnO and AZO films showed intense near band edge emission. A considerable spread from semi-insulating to n-type conductive was observed for the films, with resistivity ˜103 Ω cm and Hall mobility in 4-14 cm2 V-1 s-1 range, showing marked dependences on film thickness and oxygen pressure. Applications in the fields of microfluidic devices and flexible electronics for these ZnO and AZO films are suggested.

  15. Band diagram and rate analysis of thin film spinel LiMn2O4 formed by electrochemical conversion of ALD-grown MnO

    DOE PAGES

    Young, Matthias J.; Schnabel, Hans-Dieter; Holder, Aaron M.; ...

    2016-09-22

    Nanoscale spinel lithium manganese oxide is of interest as a high-rate cathode material for advanced battery technologies among other electrochemical applications. In this work, the synthesis of ultrathin films of spinel lithium manganese oxide (LiMn2O4) between 20 and 200 nm in thickness by room-temperature electrochemical conversion of MnO grown by atomic layer deposition (ALD) is demonstrated. The charge storage properties of LiMn2O4 thin films in electrolytes containing Li+, Na+, K+, and Mg2+ are investigated. A unified electrochemical band-diagram (UEB) analysis of LiMn2O4 informed by screened hybrid density functional theory calculations is also employed to expand on existing understanding of themore » underpinnings of charge storage and stability in LiMn2O4. It is shown that the incorporation of Li+ or other cations into the host manganese dioxide spinel structure (λ-MnO2) stabilizes electronic states from the conduction band which align with the known redox potentials of LiMn2O4. Furthermore, the cyclic voltammetry experiments demonstrate that up to 30% of the capacity of LiMn2O4 arises from bulk electronic charge-switching which does not require compensating cation mass transport. As a result, the hybrid ALD-electrochemical synthesis, UEB analysis, and unique charge storage mechanism described here provide a fundamental framework to guide the development of future nanoscale electrode materials for ion-incorporation charge storage.« less

  16. Pulsed laser deposition of Sr2FeMoO6 thin films grown on spark plasma sintered Sr2MgWO6 substrates

    NASA Astrophysics Data System (ADS)

    Santosh, M.; Lacotte, M.; David, A.; Boullay, Ph; Grygiel, C.; Pravarthana, D.; Rohrer, G. S.; Salvador, P. A.; Padhan, P.; Lüders, U.; Wang, Junling; Prellier, W.

    2017-06-01

    Sr2FeMoO6 (SFMO) films were deposited on polycrystalline spark plasma synthesized Sr2MgWO6 (SMWO) substrates. Films were grown using pulsed laser deposition at temperatures (T dep) between 720 °C and 820 °C in a vacuum environment of pressure {{P}\\text{dep}}={{10}-6} mbar (0.1 mPa); after deposition they were cooled either in a pressure {{P}\\text{cool}}={{P}\\text{dep}} or {{P}\\text{cool}}={{10}-4} mbar (10 mPa) O2. Despite the use of an isostructural substrate, the growth and cooling conditions play the primary role in determining details of the films’ structures and properties, similarly to single-crystals. Grazing x-ray and electron back-scatter diffraction indicate that vacuum-cooled films were pure perovskite-structured SFMO exhibiting grain-over-grain growth that aligned the perovskite sub-cells. SrMoO4 impurities were observed in the x-ray patterns for the oxygen-cooled films similarly to single-crystal substrates. Magnetic, electronic and magnetoresistive properties were all a function of growth and cooling environments. The Curie temperature and magnetization of the films increased with T dep up to 800 °C. The vacuum-cooled films had low-resistivities with essentially metallic conductivity (small resistivity increases occurred at low-T), while the conductivity of oxygen-cooled films were consistent with variable range hopping. The oxygen-cooled films had higher low-field magnetoresistance effects at 5 K than the vacuum-cooled films, which seems consistent with SrMoO4 forming at grain boundaries. This work opens the route to tailor the electronic properties by engineering the grain boundaries in thin films.

  17. Angular properties of pure and Ca-substituted YBa2Cu3O7-δ superconducting thin films grown on SrTiO3 and CeO2 buffered Al2O3 substrates

    NASA Astrophysics Data System (ADS)

    Augieri, A.; Celentano, G.; Ciontea, L.; Galluzzi, V.; Gambardella, U.; Halbritter, J.; Petrisor, T.; Rufoloni, A.; Vannozzi, A.

    2007-09-01

    In this work transport properties of superconducting 10 at.% Ca-substituted YBCO thin films grown on (1 0 0)-SrTiO 3 single crystal substrate (STO) and superconducting pure and 10 at.% Ca-substituted YBCO thin films grown on CeO 2 buffered Al 2O 3 substrates (CAO) have been analyzed as a function of the temperature, applied magnetic field and angle between magnetic field direction and the direction normal to the film surfaces. Particularly, the angular analysis provides an easy way to discriminate between isotropic point defects and correlated pinning sites. Despite the intragrain pinning mechanisms remained unaffected by Ca substitution, a detrimental effect on grain boundary properties clearly emerged for 10 at.% Ca concentration. This effect is enhanced in sample grown on CeO 2 buffered sapphire where a more disturbed grain boundary is expected resulting in an enhancement of the correlated pinning, already observed in pure YBCO films grown on CAO, and in a reduction of the intrinsic pinning efficiency.

  18. Sharp chemical interface in epitaxial Fe{sub 3}O{sub 4} thin films

    SciTech Connect

    Gálvez, S.; Rubio-Zuazo, J. Salas-Colera, E.; Muñoz-Noval, A.; Castro, G. R.

    2014-12-15

    Chemically sharp interface was obtained on single phase single oriented Fe{sub 3}O{sub 4} (001) thin film (7 nm) grown on NiO (001) substrate using oxygen assisted molecular beam epitaxy. Refinement of the atomic structure, stoichiometry, and oxygen vacancies were determined by soft and hard x-ray photoelectron spectroscopy, low energy electron diffraction and synchrotron based X-ray reflectivity, and X-ray diffraction. Our results demonstrate an epitaxial growth of the magnetite layer, perfect iron stoichiometry, absence of oxygen vacancies, and the existence of an intermixing free interface. Consistent magnetic and electrical characterizations are also shown.

  19. Potentiometric Zinc Ion Sensor Based on Honeycomb-Like NiO Nanostructures

    PubMed Central

    Abbasi, Mazhar Ali; Ibupoto, Zafar Hussain; Hussain, Mushtaque; Khan, Yaqoob; Khan, Azam; Nur, Omer; Willander, Magnus

    2012-01-01

    In this study honeycomb-like NiO nanostructures were grown on nickel foam by a simple hydrothermal growth method. The NiO nanostructures were characterized by field emission electron microscopy (FESEM), high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (XRD) techniques. The characterized NiO nanostructures were uniform, dense and polycrystalline in the crystal phase. In addition to this, the NiO nanostructures were used in the development of a zinc ion sensor electrode by functionalization with the highly selective zinc ion ionophore 12-crown-4. The developed zinc ion sensor electrode has shown a good linear potentiometric response for a wide range of zinc ion concentrations, ranging from 0.001 mM to 100 mM, with sensitivity of 36 mV/decade. The detection limit of the present zinc ion sensor was found to be 0.0005 mM and it also displays a fast response time of less than 10 s. The proposed zinc ion sensor electrode has also shown good reproducibility, repeatability, storage stability and selectivity. The zinc ion sensor based on the functionalized NiO nanostructures was also used as indicator electrode in potentiometric titrations and it has demonstrated an acceptable stoichiometric relationship for the determination of zinc ion in unknown samples. The NiO nanostructures-based zinc ion sensor has potential for analysing zinc ion in various industrial, clinical and other real samples. PMID:23202217

  20. Technology and Application of Transition Metal Oxide of W-V-O as Functional Layers and NiO Thin Films as Counter Electrode Material in Electrochromic "Smart Windows"

    NASA Astrophysics Data System (ADS)

    Bodurov, Georgi; Ivanova, Tatyana; Gesheva, Kostadinka

    The present study is related to preparation and investigation of mixed W-V-O films, deposited on conductive glass substrates by atmospheric pressure chemical vapor deposition. The presence of lower-temperature precursor V(CO)6 lead to faster growing of the mixed oxide film. The results show two times higher growth-rate compared to single oxide of WO3. The color efficiency calculated is 20 cm2/C, optical modulation 65.2%. Vibrational spectra studied by Raman and FTIR spectroscopy show Raman peaks and absorption bands revealing monoclinic WO3 and orthorhombic V2O5 phases, separately existing in the mixed oxide film structure. The surface morphology is observed by AFM. Films transmittance and reflectance characterization are performed. For the counter electrode in the EC, NiO films are deposited electrochemically. The UV-VIS-NIR optical measurements performed in the spectral range of 300 - 1000 nm show that films possess transmittance in the range of 70% - 85%. This high transmittance of the counter electrode film would contribute to the needed high initial optical transmittance of the "smart window".