Advances toward industrialization of novel molten salt electrochemical processes.

PubMed

Ito, Yasuhiko; Nishikiori, Tokujiro; Tsujimura, Hiroyuki

2016-08-15

We have invented various novel molten salt electrochemical processes, that can be put to practical use in the fields of energy and materials. These processes are promising from both technological and commercial viewpoints, and they are currently under development for industrial application. To showcase current developments in work toward industrialization, we focus here on three of these processes: (1) electrolytic synthesis of ammonia from water and nitrogen under atmospheric pressure, (2) electrochemical formation of carbon film, and (3) plasma-induced discharge electrolysis to produce nanoparticles.

A novel high-efficiency stable atmospheric microwave plasma device for fluid processing based on ridged waveguide

NASA Astrophysics Data System (ADS)

Xiao, Wei; Huang, Kama; He, Jianbo; Wu, Ying

2017-09-01

The waveguide-based microwave plasma device is widely used to generate atmospheric plasma for some industrial applications. Nevertheless, the traditional tapered waveguide device has limited power efficiency and produces unstable plasma. A novel ridged waveguide with an oblique hole is proposed to produce microwave atmospheric plasma for fluid processing. By using the ridged waveguide, the microwave field can be well focused, which can sustain plasma at relatively low power. Besides, an oblique hole is used to decrease the power reflection and generate a stable plasma torch especially in the case of high flowing rates. Experiments have been performed with the air flowing rates ranging from 500 l h-1 to 1000 l h-1 and the microwave working frequency of 2.45 GHz. The results show that in comparison with the conventional tapered waveguide, this novel device can both sustain plasma at relative low power and increase the power transfer efficiency by 11% from microwave to plasma. Moreover, both devices are used to process the waste gas-CO and CH4. Significantly, the removal efficiency for CO and CH4 can be increased by 19.7% and 32% respectively in the ridged waveguide compared with the tapered waveguide. It demonstrates that the proposed device possesses a great potential in industrial applications because of its high efficiency and stable performance.

Freeze-drying process monitoring using a cold plasma ionization device.

PubMed

Mayeresse, Y; Veillon, R; Sibille, P H; Nomine, C

2007-01-01

A cold plasma ionization device has been designed to monitor freeze-drying processes in situ by monitoring lyophilization chamber moisture content. This plasma device, which consists of a probe that can be mounted directly on the lyophilization chamber, depends upon the ionization of nitrogen and water molecules using a radiofrequency generator and spectrometric signal collection. The study performed on this probe shows that it is steam sterilizable, simple to integrate, reproducible, and sensitive. The limitations include suitable positioning in the lyophilization chamber, calibration, and signal integration. Sensitivity was evaluated in relation to the quantity of vials and the probe positioning, and correlation with existing methods, such as microbalance, was established. These tests verified signal reproducibility through three freeze-drying cycles. Scaling-up studies demonstrated a similar product signature for the same product using pilot-scale and larger-scale equipment. On an industrial scale, the method efficiently monitored the freeze-drying cycle, but in a larger industrial freeze-dryer the signal was slightly modified. This was mainly due to the positioning of the plasma device, in relation to the vapor flow pathway, which is not necessarily homogeneous within the freeze-drying chamber. The plasma tool is a relevant method for monitoring freeze-drying processes and may in the future allow the verification of current thermodynamic freeze-drying models. This plasma technique may ultimately represent a process analytical technology (PAT) approach for the freeze-drying process.

Plasma Processes for Semiconductor Fabrication

NASA Astrophysics Data System (ADS)

Hitchon, W. N. G.

1999-01-01

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

Emerging applications of low temperature gas plasmas in the food industry.

PubMed

Shaw, Alex; Shama, Gilbert; Iza, Felipe

2015-06-16

The global burden of foodborne disease due to the presence of contaminating micro-organisms remains high, despite some notable examples of their successful reduction in some instances. Globally, the number of species of micro-organisms responsible for foodborne diseases has increased over the past decades and as a result of the continued centralization of the food processing industry, outbreaks now have far reaching consequences. Gas plasmas offer a broad range of microbicidal capabilities that could be exploited in the food industry and against which microbial resistance would be unlikely to occur. In addition to reducing the incidence of disease by acting on the micro-organisms responsible for food spoilage, gas plasmas could also play a role in increasing the shelf-life of perishable foods and thereby reduce food wastage with positive financial and environmental implications. Treatment need not be confined to the food itself but could include food processing equipment and also the environment in which commercial food processing occurs. Moreover, gas plasmas could also be used to bring about the degradation of undesirable chemical compounds, such as allergens, toxins, and pesticide residues, often encountered on foods and food-processing equipment. The literature on the application of gas plasmas to food treatment is beginning to reveal an appreciation that attention needs also to be paid to ensuring that the key quality attributes of foods are not significantly impaired as a result of treatment. A greater understanding of both the mechanisms by which micro-organisms and chemical compounds are inactivated, and of the plasma species responsible for this is forming. This is significant, as this knowledge can then be used to design plasma systems with tailored compositions that will achieve maximum efficacy. Better understanding of the underlying interactions will also enable the design and implementation of control strategies capable of minimizing variations in plasma treatment efficacy despite perturbations in environmental and operational conditions.

PREFACE: 26th Symposium on Plasma Science for Materials (SPSM-26)

NASA Astrophysics Data System (ADS)

2014-06-01

26th Symposium on Plasma Science for Materials (SPSM-26) Takayuki Watanabe The 26th Symposium on Plasma Science for Materials (SPSM-26) was held in Fukuoka, Japan on September 23-24, 2013. SPSM has been held annually since 1988 under the sponsorship of The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science (JSPS). This symposium is one of the major activities of the Committee, which is organized by researchers in academia and industry for the purpose of advancing intersectional scientific information exchange and discussion of science and technology of plasma materials processing. Plasma processing have attracted extensive attention due to their unique advantages, and it is expected to be utilized for a number of innovative industrial applications such as synthesis of high-quality and high-performance nanomaterials. The advantages of plasmas including high chemical reactivity in accordance with required chemical reactions are beneficial for innovative processing. In recent years, plasma materials processing with reactive plasmas has been extensively employed in the fields of environmental issues and biotechnology. This conference seeks to bring different scientific communities together to create a forum for discussing the latest developments and issues. The conference provides a platform for the exploration of both fundamental topics and new applications of plasmas by the contacts between science, technology, and industry. The conference was organized in plenary lectures, invited, contributed oral presentations, and poster sessions. At this meeting, we had 142 participants from 10 countries and 104 presentations, including 11 invited presentations. This year, we arranged special topical sessions that cover Plasma Medicine and Biotechnologies, Business and Academia Cooperation, Plasma with Liquids, Plasma Processes for Nanomaterials, together with Basic, Electronics, and Thermal Plasma sessions. This special issue presents 28 papers that are selected via strict peer-review process from full papers submitted for the proceedings of the conference. The topics range from basic physics and chemistry of plasma processing to a broad variety of materials processing and environmental applications. This proceeding offers an overview on the recent advances in thermal and non-equilibrium plasmas as well as the challenges ahead in the field of plasma research and applications among engineers and scientists. It is an honor to present this volume of Journal of Physics: Conference Series and we deeply thank the authors for their enthusiastic and high-grade contribution. The editors hope that this proceeding will be useful and helpful for deepening our understanding of science and technology of plasma materials processing and also for stimulating further development of the plasma technology. Finally, I would like to thank the organizing committee and organizing secretariat of SPSM-26, and the participants of the conference for contribution to a successful and exciting meeting. The conference was chaired by Prof. Masaharu Shiratani, Kyushu University. I would also like to thank the financial support from The 153rd Committee on Plasma Materials Science. Editors of SPMS-26 Prof Takayuki Watanabe, Kyushu University, Japan Prof Makoto Sekine, Nagoya University, Japan Prof Takanori Ichiki, The University of Tokyo, Japan Prof Masaharu Shiratani, Kyushu University, Japan Prof Akimitsu Hatta, Kochi University of Technology, Japan Sponsors and Supporting Organization: The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science

Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing

NASA Astrophysics Data System (ADS)

Yu, Keven; Feldbaum, Michael; Pandhumsoporn, Tam; Gadgil, Prashant

1999-08-01

ICP plasma etching is gaining widespread acceptance as an enabling micromachining technology for advanced MEMS fabrication. Whereas this technology has shown a capability of delivering multiple novel applications for R and D, its acceptance by industry for high volume production has been limited. This acceptance into production will only occur when the plasma etching equipment with this technology offers the device performance, throughput, reliability, and uptime criteria required by a production facility. The design of the plasma etcher using this technology and the process capability it consequently delivers, has significant implications in making this a reality. Alcatel has been supplying such a technology to this MEMS industry for over 5 years and in the interim has evolved its product and process to make this technology production worthy. Alcatel's next generation etcher, the Alcatel 601E, offers multiple advantages to MEMS manufacturers in realizing their production goals.

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

NASA Astrophysics Data System (ADS)

Styrnoll, T.; Harhausen, J.; Lapke, M.; Storch, R.; Brinkmann, R. P.; Foest, R.; Ohl, A.; Awakowicz, P.

2013-08-01

The application of a multipole resonance probe (MRP) for diagnostic and monitoring purposes in a plasma ion-assisted deposition (PIAD) process is reported. Recently, the MRP was proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2011 Plasma Sources Sci. Technol. 20 042001). The major advantages of the MRP are its robustness against dielectric coating and its high sensitivity to measure the electron density. The PIAD process investigated is driven by the advanced plasma source (APS), which generates an ion beam in the deposition chamber for the production of high performance optical coatings. With a background neutral pressure of p0 ˜ 20 mPa the plasma expands from the source region into the recipient, leading to an inhomogeneous spatial distribution. Electron density and electron temperature vary over the distance from substrate (ne ˜ 109 cm-3 and Te,eff ˜ 2 eV) to the APS (ne ≳ 1012 cm-3 and Te,eff ˜ 20 eV) (Harhausen et al 2012 Plasma Sources Sci. Technol. 21 035012). This huge variation of the plasma parameters represents a big challenge for plasma diagnostics to operate precisely for all plasma conditions. The results obtained by the MRP are compared to those from a Langmuir probe chosen as reference diagnostics. It is demonstrated that the MRP is suited for the characterization of the PIAD plasma as well as for electron density monitoring. The latter aspect offers the possibility to develop new control schemes for complex industrial plasma environments.

Applications of Pulsed Power in Advanced Oxidation and Reduction Processes for Pollution Control

DTIC Science & Technology

1993-06-01

electrical driver pulse width and rise time, electrical drive circuit coupling to plasma cells, and the role of UV light in the plasma chemistry and...will permit industrial service. Basic understanding of the plasma chemistry has evolved to the point where trends and equipment scaling can be

FOREWORD: 23rd National Symposium on Plasma Science & Technology (PLASMA-2008)

NASA Astrophysics Data System (ADS)

Das, A. K.

2010-01-01

The Twentieth Century has been a defining period for Plasma Science and Technology. The state of ionized matter, so named by Irving Langmuir in the early part of twentieth century, has now evolved in to a multidisciplinary area with scientists and engineers from various specializations working together to exploit the unique properties of the plasma medium. There have been great improvements in the basic understanding of plasmas as a many body system bound by complex collective Coulomb interactions of charges, atoms, molecules, free radicals and photons. Simultaneously, many advanced plasma based technologies are increasingly being implemented for industrial and societal use. The emergence of the multination collaborative project International Thermonuclear Experimental Reactor (ITER) project has provided the much needed boost to the researchers working on thermonuclear fusion plasmas. In addition, the other plasma applications like MHD converters, hydrogen generation, advanced materials (synthesis, processing and surface modification), environment (waste beneficiation, air and water pollution management), nanotechnology (synthesis, deposition and etching), light production, heating etc are actively being pursued in governmental and industrial sectors. For India, plasma science and technology has traditionally remained an important area of research. It was nearly a century earlier that the Saha ionization relation pioneered the way to interpret experimental data from a vast range of near equilibrium plasmas. Today, Indian research contributions and technology demonstration capabilities encompass thermonuclear fusion devices, nonlinear plasma phenomena, plasma accelerators, beam plasma interactions, dusty and nonneutral plasmas, industrial plasmas and plasma processing of materials, nano synthesis and structuring, astrophysical and space plasmas etc. India's participation in the ITER programme is now reflected in increased interest in the research and development efforts on Tokamak technology and physics of magnetized fusion plasmas. Our industries have already adopted a large number of plasma processes related to manufacturing, lighting and surface engineering. Indian universities and National Institutes have successfully taken up research projects and building of demonstration equipment that are being used in strategic as well as other industrial applications. In addition, and more importantly, plasma science has triggered research and development effort in many related areas like power supplies, specialized instrumentation and controls, magnets, diagnostics and monitoring, lasers, electron beams, vacuum systems, thermal engineering, material science, fluid dynamics, molecular and nano engineering, molecular chemistry etc. In short, plasma science and technology in India has reached a stage of maturity that can be harnessed for industrial and societal use. The expertise and core competence developed over the years need to be sustained through interactions among researchers as well as nurturing of new research efforts. The Annual Plasma Symposiums have eminently worked towards achievement of that purpose. Like all years, Plasma - 2008 is built around the entire national effort in this field with a special focus on 'Plasmas in Nuclear Fuel Cycle (PANFC)'. The program includes several plenary lectures, invited talks and contributed papers. The manuscripts have been peer reviewed and compiled in the form of Conference Proceedings. I am sure that the online proceedings will be useful and serve as a valuable reference material for active researchers in this field. I would like to take this opportunity to gratefully acknowledge the help and guidance of the National Advisory Committee Chaired by Professor P K Kaw, Director, Institute of Plasma Research, Gandhinagar during the organization of this symposium. My sincere thanks to Dr S Banerjee, Director, Bhabha Atomic Research Center, an acknowledged expert in the field of Materials Science and Technology, for delivering the key note address to set the tenor of the symposium. I would also like to thank the Plasma Science Society of India (PSSI) for agreeing to hold this important event at BARC. Thanks are due to Dr L M Gantayet, Director, BTDG, BARC and chairman, Scientific Program Committee and all my colleagues in the Symposium Organizing Committee who have made this symposium possible. Finally, our thanks to all the Funding agencies, Board of Research in Nuclear Science, Department of Science and Technology, The Board of Fusion Research, and all industrial exhibitor and sponsors for their unstinted support and encouragement. Dr A K Das Chairman, Organizing Committee Bhabha Atomic Research Center, Mumbai

Low-temperature ({<=}200 Degree-Sign C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

DOE Office of Scientific and Technical Information (OSTI.GOV)

Samal, Nigamananda; Du Hui; Luberoff, Russell

Titanium nitride (TiN) has been widely used in the semiconductor industry for its diffusion barrier and seed layer properties. However, it has seen limited adoption in other industries in which low temperature (<200 Degree-Sign C) deposition is a requirement. Examples of applications which require low temperature deposition are seed layers for magnetic materials in the data storage (DS) industry and seed and diffusion barrier layers for through-silicon-vias (TSV) in the MEMS industry. This paper describes a low temperature TiN process with appropriate electrical, chemical, and structural properties based on plasma enhanced atomic layer deposition method that is suitable for themore » DS and MEMS industries. It uses tetrakis-(dimethylamino)-titanium as an organometallic precursor and hydrogen (H{sub 2}) as co-reactant. This process was developed in a Veeco NEXUS Trade-Mark-Sign chemical vapor deposition tool. The tool uses a substrate rf-biased configuration with a grounded gas shower head. In this paper, the complimentary and self-limiting character of this process is demonstrated. The effects of key processing parameters including temperature, pulse time, and plasma power are investigated in terms of growth rate, stress, crystal morphology, chemical, electrical, and optical properties. Stoichiometric thin films with growth rates of 0.4-0.5 A/cycle were achieved. Low electrical resistivity (<300 {mu}{Omega} cm), high mass density (>4 g/cm{sup 3}), low stress (<250 MPa), and >85% step coverage for aspect ratio of 10:1 were realized. Wet chemical etch data show robust chemical stability of the film. The properties of the film have been optimized to satisfy industrial viability as a Ruthenium (Ru) preseed liner in potential data storage and TSV applications.« less

Plasma characterization studies for materials processing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pfender, E.; Heberlein, J.

New applications for plasma processing of materials require a more detailed understanding of the fundamental processes occurring in the processing reactors. We have developed reactors offering specific advantages for materials processing, and we are using modeling and diagnostic techniques for the characterization of these reactors. The emphasis is in part set by the interest shown by industry pursuing specific plasma processing applications. In this paper we report on the modeling of radio frequency plasma reactors for use in materials synthesis, and on the characterization of the high rate diamond deposition process using liquid precursors. In the radio frequency plasma torchmore » model, the influence of specific design changes such as the location of the excitation coil on the enthalpy flow distribution is investigated for oxygen and air as plasma gases. The diamond deposition with liquid precursors has identified the efficient mass transport in form of liquid droplets into the boundary layer as responsible for high growth, and the chemical properties of the liquid for the film morphology.« less

Plasma Processing of Materials

DTIC Science & Technology

1985-02-22

inert gas or in a reduced pressure environment) one can obtain rapidly solidified metastable (i.e., amorphous, microcrystalline, and supersaturated...integrated circuits dnd thus is an area of’vital : importance to our electronics industry. Applications utilizing noble gas plasmas, such as ion-plating...phenomena and probably will not benefit -ubstantially from acditional basic research. Applications utilizing molecular gas plasmas, where reactive species

Use of Atmospheric Pressure Cold Plasma for Meat Industry.

PubMed

Lee, Juri; Lee, Cheol Woo; Yong, Hae In; Lee, Hyun Jung; Jo, Cheorun; Jung, Samooel

2017-01-01

Novel, effective methods to control and prevent spoilage and contamination by pathogenic microorganisms in meat and meat products are in constant demand. Non-thermal pasteurization is an ideal method for the preservation of meat and meat products because it does not use heat during the pasteurization process. Atmospheric pressure cold plasma (APCP) is a new technology for the non-thermal pasteurization of meat and meat products. Several recent studies have shown that APCP treatment reduces the number of pathogenic microorganisms in meat and meat products. Furthermore, APCP treatment can be used to generate nitrite, which is an essential component of the curing process. Here, we introduce the effectiveness of APCP treatment as a pasteurization method and/or curing process for use in the meat and meat product processing industry.

Use of Atmospheric Pressure Cold Plasma for Meat Industry

PubMed Central

Lee, Juri; Lee, Cheol Woo; Yong, Hae In; Lee, Hyun Jung; Jo, Cheorun; Jung, Samooel

2017-01-01

Novel, effective methods to control and prevent spoilage and contamination by pathogenic microorganisms in meat and meat products are in constant demand. Non-thermal pasteurization is an ideal method for the preservation of meat and meat products because it does not use heat during the pasteurization process. Atmospheric pressure cold plasma (APCP) is a new technology for the non-thermal pasteurization of meat and meat products. Several recent studies have shown that APCP treatment reduces the number of pathogenic microorganisms in meat and meat products. Furthermore, APCP treatment can be used to generate nitrite, which is an essential component of the curing process. Here, we introduce the effectiveness of APCP treatment as a pasteurization method and/or curing process for use in the meat and meat product processing industry. PMID:28943759

Fructooligosaccharides integrity after atmospheric cold plasma and high-pressure processing of a functional orange juice.

PubMed

Almeida, Francisca Diva Lima; Gomes, Wesley Faria; Cavalcante, Rosane Souza; Tiwari, Brijesh K; Cullen, Patrick J; Frias, Jesus Maria; Bourke, Paula; Fernandes, Fabiano A N; Rodrigues, Sueli

2017-12-01

In this study, the effect of atmospheric pressure cold plasma and high-pressure processing on the prebiotic orange juice was evaluated. Orange juice containing 7g/100g of commercial fructooligosaccharides (FOS) was directly and indirectly exposed to a plasma discharge at 70kV with processing times of 15, 30, 45 and 60s. For high-pressure processing, the juice containing the same concentration of FOS was treated at 450MPa for 5min at 11.5°C in an industrial equipment (Hyperbaric, model: 300). After the treatments, the fructooligosaccharides were qualified and quantified by thin layer chromatography. The organic acids and color analysis were also evaluated. The maximal overall fructooligosaccharides degradation was found after high-pressure processing. The total color difference was <3.0 for high-pressure and plasma processing. citric and ascorbic acid (Vitamin C) showed increased content after plasma and high-pressure treatment. Thus, atmospheric pressure cold plasma and high-pressure processing can be used as non-thermal alternatives to process prebiotic orange juice. Copyright © 2017 Elsevier Ltd. All rights reserved.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Detering, B.A.; Kong, P.C.; Thomas, C.P.

This paper describes the experimental demonstration of a process for direct conversion of methane to acetylene in a thermal plasma. The process utilizes a thermal plasma to dissociate methane and form an equilibrium mixture of acetylene followed by a supersonic expansion of the hot gas to preserve the produced acetylene in high yield. The high translational velocities and rapid cooling result in an overpopulation of atomic hydrogen which persists throughout the expansion process. The presence of atomic hydrogen shifts the equilibrium composition by inhibiting complete pyrolysis of methane and acetylene to solid carbon. This process has the potential to reducemore » the cost of producing acetylene from natural gas. Acetylene and hydrogen produced by this process could be used directly as industrial gases, building blocks for synthesis of industrial chemicals, or oligomerized to long chain liquid hydrocarbons for use as fuels. This process produces hydrogen and ultrafine carbon black in addition to acetylene.« less

Comparison of Plasma Polymerization under Collisional and Collision-Less Pressure Regimes.

PubMed

Saboohi, Solmaz; Jasieniak, Marek; Coad, Bryan R; Griesser, Hans J; Short, Robert D; Michelmore, Andrew

2015-12-10

While plasma polymerization is used extensively to fabricate functionalized surfaces, the processes leading to plasma polymer growth are not yet completely understood. Thus, reproducing processes in different reactors has remained problematic, which hinders industrial uptake and research progress. Here we examine the crucial role pressure plays in the physical and chemical processes in the plasma phase, in interactions at surfaces in contact with the plasma phase, and how this affects the chemistry of the resulting plasma polymer films using ethanol as the gas precursor. Visual inspection of the plasma reveals a change from intense homogeneous plasma at low pressure to lower intensity bulk plasma at high pressure, but with increased intensity near the walls of the chamber. It is demonstrated that this occurs at the transition from a collision-less to a collisional plasma sheath, which in turn increases ion and energy flux to surfaces at constant RF power. Surface analysis of the resulting plasma polymer films show that increasing the pressure results in increased incorporation of oxygen and lower cross-linking, parameters which are critical to film performance. These results and insights help to explain the considerable differences in plasma polymer properties observed by different research groups using nominally similar processes.

Fundamental study of an industrial reactive HPPMS (Cr,Al)N process

NASA Astrophysics Data System (ADS)

Bobzin, K.; Brögelmann, T.; Kruppe, N. C.; Engels, M.; von Keudell, A.; Hecimovic, A.; Ludwig, A.; Grochla, D.; Banko, L.

2017-07-01

In this work, a fundamental investigation of an industrial (Cr,Al)N reactive high power pulsed magnetron sputtering (HPPMS) process is presented. The results will be used to improve the coating development for the addressed application, which is the tool coating for plastics processing industry. Substrate-oriented plasma diagnostics and deposition of the (Cr,Al)N coatings were performed for a variation of the HPPMS pulse frequency with values from f = 300 Hz to f = 2000 Hz at constant average power P = 2.5 kW and pulse length ton = 40 μs. The plasma was investigated using an oscilloscope, an intensified charge coupled device camera, phase-resolved optical emission spectroscopy, and an energy-dispersive mass spectrometer. The coating properties were determined by means of scanning electron microscopy, glow discharge optical emission spectroscopy, cantilever stress sensors, nanoindentation, and synchrotron X-ray diffraction. Regarding the plasma properties, it was found that the average energy within the plasma is nearly constant for the frequency variation. In contrast, the metal to gas ion flux ratio is changed from JM/JG = 0.51 to JM/JG = 0.10 for increasing frequency. Regarding the coating properties, a structure refinement as well as lower residual stresses, higher universal hardness, and a changing crystal orientation from (111) to (200) were observed at higher frequencies. By correlating the plasma and coating properties, it can be concluded that the change in the gas ion to metal ion flux ratio results in a competitive crystal growth of the film, which results in changing coating properties.

The line roughness improvement with plasma coating and cure treatment for 193nm lithography and beyond

NASA Astrophysics Data System (ADS)

Zheng, Erhu; Huang, Yi; Zhang, Haiyang

2017-03-01

As CMOS technology reaches 14nm node and beyond, one of the key challenges of the extension of 193nm immersion lithography is how to control the line edge and width roughness (LER/LWR). For Self-aligned Multiple Patterning (SaMP), LER becomes larger while LWR becomes smaller as the process proceeds[1]. It means plasma etch process becomes more and more dominant for LER reduction. In this work, we mainly focus on the core etch solution including an extra plasma coating process introduced before the bottom anti reflective coating (BARC) open step, and an extra plasma cure process applied right after BARC-open step. Firstly, we leveraged the optimal design experiment (ODE) to investigate the impact of plasma coating step on LER and identified the optimal condition. ODE is an appropriate method for the screening experiments of non-linear parameters in dynamic process models, especially for high-cost-intensive industry [2]. Finally, we obtained the proper plasma coating treatment condition that has been proven to achieve 32% LER improvement compared with standard process. Furthermore, the plasma cure scheme has been also optimized with ODE method to cover the LWR degradation induced by plasma coating treatment.

Advances and directions of ion nitriding/carburizing

NASA Technical Reports Server (NTRS)

Spalvins, Talivaldis

1989-01-01

Ion nitriding and carburizing are plasma activated thermodynamic processes for the production of case hardened surface layers not only for ferrous materials, but also for an increasing number of nonferrous metals. When the treatment variables are properly controlled, the use of nitrogenous or carbonaceous glow discharge medium offers great flexibility in tailoring surface/near-surface properties independently of the bulk properties. The ion nitriding process has reached a high level of maturity and has gained wide industrial acceptance, while the more recently introduced ion carburizing process is rapidly gaining industrial acceptance. The current status of plasma mass transfer mechanisms into the surface regarding the formation of compound and diffusion layers in ion nitriding and carbon build-up ion carburizing is reviewed. In addition, the recent developments in design and construction of advanced equipment for obtaining optimized and controlled case/core properties is summarized. Also, new developments and trends such as duplex plasma treatments and alternatives to dc diode nitriding are highlighted.

Good manufacturing practice (GMP) compliance in the biologics sector: plasma fractionation.

PubMed

Ways, J P; Preston, M S; Baker, D; Huxsoll, J; Bablak, J

1999-12-01

The U.S. blood supply is the safest it has ever been. Due to blood safety and the introduction of viral inactivation/clearance technologies, protein therapies derived from human blood have also in recent years had a history of product safety. Nevertheless, since 1995, the plasma-fractionation industry has experienced increased compliance-related actions by the Food and Drug Administration (FDA), as shown by a substantive increase in the number of FDA 483 inspectional observations, FDA warning letters and other FDA regulatory action. An evaluation of these trends shows that they reflect the implementation by the FDA of increased inspectional interest in the plasma-fractionation industry and an evolution of inspectional practices and standards of current good manufacturing practice (cGMP). Plasma fractionators have responded to FDA actions by carefully evaluating and addressing each inspectional observation, assessing impact to product and taking appropriate actions, including corrective actions to prevent future occurrence. They have made major investments in facilities, quality systems, personnel and training to meet the evolving standards of cGMP and in an effort to implement these standards systemically. Through industry associations, manufacturers have further enhanced product safety by adopting additional voluntary standards for plasma to prevent the entry of potentially unsuitable plasma into the production process. The industry remains committed to application of cGMP and to working with the FDA in further evolution of these standards while striving to assure a continued supply of safe, pure and effective plasma-derived therapies.

PREFACE: 11th Asia-Pacific Conference on Plasma Science and Technology (APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)

NASA Astrophysics Data System (ADS)

Watanabe, Takayuki; Kaneko, Toshio; Sekine, Makoto; Tanaka, Yasunori

2013-06-01

The 11th Asia-Pacific Conference on Plasma Science and Technology (APCPST-11) was held in Kyoto, Japan on 2-5 October 2012 with the 25th Symposium on Plasma Science for Materials (SPSM-25). SPSM has been held annually since 1988 under the sponsorship of The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science (JSPS). This symposium is one of the major activities of the Committee, which is organized by researchers in academia and industry for the purpose of advancing intersectional scientific information exchange and discussion of science and technology of plasma materials processing. APCPST and SPSM are jointly held biennially to survey the current status of low temperature and thermal plasma physics and chemistry for industrial applications. The whole area of plasma processing was covered from fundamentals to applications. Previous meetings were held in China, Japan, Korea, and Australia, attended by scientists from the Asia-Pacific and other countries. The joint conference was organized in plenary lectures, invited, contributed oral presentations and poster sessions. At this meeting, we had 386 participants from 10 countries and 398 presentations, including 26 invited presentations. This year, we arranged special topical sessions that covered green innovation, life innovation, and technical reports from industry. This conference seeks to bring the plasma community together and to create a forum for discussing the latest developments and issues, the challenges ahead in the field of plasma research and applications among engineers and scientists in Asia, the Pacific Rim, as well as Europe. This volume presents 44 papers that were selected via a strict peer-review process from full papers submitted for the proceedings of the conference. The topics range from the basic physics and chemistry of plasma processing to a broad variety of materials processing and environmental applications. This volume offers an overview of recent advances in thermal and non-equilibrium plasmas as well as on more new and innovative developments in the field of life innovation, green innovation and a technical report session. The editors hope that this volume will be useful and helpful for deepening our understanding of science and technology of plasma materials processing and also for stimulating further development of the plasma technology. Finally, we would like to thank the conference chairmen, the members of the organizing committee, the advisory committee, the executive committee, the program committee, the publication committee, organizing secretariat and financial support from The 153rd Committee on Plasma Materials Science, JSPS. Sponsors and Supporting Organization: The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science Organizing Committee Chairperson: Osamu Tsuji, SAMCO Corporation, Japan Advisory Committee Chairperson: Akihisa Matsuda, Osaka University, Japan Executive Committee Chairperson: Masaru Hori, Nagoya University, Japan Program Committee Chairperson: Takamasa Ishigaki, Hosei University, Japan Publication Committee Chairperson: Takayuki Watanabe, Kyushu University Editors of APCPST-11 and SPMS-25 Professor Takayuki Watanabe, Kyushu University, Japan Professor Toshio Kaneko, Tohoku University, Japan Professor Makoto Sekine, Nagoya University, Japan Professor Yasunori Tanaka, Kanazawa University, Japan

Twenty-First Century Research Needs in Electrostatic Processes Applied to Industry and Medicine

NASA Technical Reports Server (NTRS)

Mazumder, M. K.; Sims, R. A.; Biris, A. S.; Srirama, P. K.; Saini, D.; Yurteri, C. U.; Trigwell, S.; De, S.; Sharma, R.

2005-01-01

From the early century Nobel Prize winning (1923) experiments with charged oil droplets, resulting in the discovery of the elementary electronic charge by Robert Millikan, to the early 21st century Nobel Prize (2002) awarded to John Fenn for his invention of electrospray ionization mass spectroscopy and its applications to proteomics, electrostatic processes have been successfully applied to many areas of industry and medicine. Generation, transport, deposition, separation, analysis, and control of charged particles involved in the four states of matter: solid, liquid, gas, and plasma are of interest in many industrial and biomedical processes. In this paper, we briefly discuss some of the applications and research needs involving charged particles in industrial and medical applications including: (1) Generation and deposition of unipolarly charged dry powder without the presence of ions or excessive ozone, (2) Control of tribocharging process for consistent and reliable charging, (3) Thin film (less than 25 micrometers) powder coating and Powder coating on insulative surfaces, (4) Fluidization and dispersion of fine powders, (5) Mitigation of Mars dust, (6) Effect of particle charge on the lung deposition of inhaled medical aerosols, (7) Nanoparticle deposition, and (8) Plasma/Corona discharge processes. A brief discussion on the measurements of charged particles and suggestions for research needs are also included.

Atomic Precision Plasma Processing - Modeling Investigations

NASA Astrophysics Data System (ADS)

Rauf, Shahid

2016-09-01

Sub-nanometer precision is increasingly being required of many critical plasma processes in the semiconductor industry. Some of these critical processes include atomic layer etch and plasma enhanced atomic layer deposition. Accurate control over ion energy and ion / radical composition is needed during plasma processing to meet the demanding atomic-precision requirements. While improvements in mainstream inductively and capacitively coupled plasmas can help achieve some of these goals, newer plasma technologies can expand the breadth of problems addressable by plasma processing. Computational modeling is used to examine issues relevant to atomic precision plasma processing in this paper. First, a molecular dynamics model is used to investigate atomic layer etch of Si and SiO2 in Cl2 and fluorocarbon plasmas. Both planar surfaces and nanoscale structures are considered. It is shown that accurate control of ion energy in the sub-50 eV range is necessary for atomic scale precision. In particular, if the ion energy is greater than 10 eV during plasma processing, several atomic layers get damaged near the surface. Low electron temperature (Te) plasmas are particularly attractive for atomic precision plasma processing due to their low plasma potential. One of the most attractive options in this regard is energetic-electron beam generated plasma, where Te <0.5 eV has been achieved in plasmas of molecular gases. These low Te plasmas are computationally examined in this paper using a hybrid fluid-kinetic model. It is shown that such plasmas not only allow for sub-5 eV ion energies, but also enable wider range of ion / radical composition. Coauthors: Jun-Chieh Wang, Jason Kenney, Ankur Agarwal, Leonid Dorf, and Ken Collins.

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella biofilms

USDA-ARS?s Scientific Manuscript database

Cross-contamination of fresh produce and other foods from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a rapid, waterless, zero-contact, chemical-free method for removing pathogens from food-contact surfaces. Cold plasma was tested for its abili...

Analysis of the correlation between plasma plume and keyhole behavior in laser metal welding for the modeling of the keyhole geometry

NASA Astrophysics Data System (ADS)

Tenner, F.; Brock, C.; Klämpfl, F.; Schmidt, M.

2015-01-01

The process of laser metal welding is widely used in industry. Nevertheless, there is still a lack of complete process understanding and control. For analyzing the process we used two high-speed cameras. Therefore, we could image the plasma plume (which is directly accessible by a camera) and the keyhole (where most of the process instabilities occur) during laser welding isochronously. Applying different image processing steps we were able to find a correlation between those two process characteristics. Additionally we imaged the plasma plume from two directions and were able to calculate a volume with respect to the vaporized material the plasma plume carries. Due to these correlations we are able to conclude the keyhole stability from imaging the plasma plume and vice versa. We used the found correlation between the keyhole behavior and the plasma plume to explain the effect of changing laser power and feed rate on the keyhole geometry. Furthermore, we tried to outline the phenomena which have the biggest effect on the keyhole geometry during changes of feed rate and laser power.

Investigation of the AC Plasma Torch Working Conditions for the Plasma Chemical Applications

NASA Astrophysics Data System (ADS)

Safronov, A. A.; Vasilieva, O. B.; Dudnik, J. D.; E Kuznetsov, V.; Shiryaev, V. N.; Subbotin, D. I.; Pavlov, A. V.

2017-04-01

The presented design and parameters of a three-phase AC plasma torch with the power up to 500 kW, flow rate of air 30-50 g/s (temperature up to 5000 K) could be used in different plasma chemical processes. Range of measured plasma temperature is 3500-5000 K. The paper presents investigations of the plasma torch operation modes for its application in plasma chemical technologies. Plasma chemical technologies for various purposes (processing, destruction of various wastes, including technological and hazardous waste, conversion or production of chemicals to obtain nanoscale materials, etc.) are very promising in terms of the process efficiency. Their industrial use is difficult due to the lack of inexpensive and reliable plasma torches providing the desired level of temperature, enthalpy of the working gas and other necessary conditions for the process. This problem can be solved using a considered design of a three-phase alternating current plasma torch with power of 150-500 kW with working gas flow rate of 30-50 g/s with mass average temperature up to 5000K on the basis of which an industrial plasma chemical plant can be created. The basis of the plasma torch operation is a railgun effect that is the principle of arc movement in the field of its own current field. Thanks to single supply of power to the arc, arcs forming in the discharge chamber of the plasma torch move along the electrodes under the action of electrodynamic forces resulting from the interaction of the arc current with its own magnetic field. Under the condition of the three-phase supply voltage, arc transits from the electrode to the electrode with change in the anodic and cathodic phases with frequency of 300 Hz. A special feature of this design is the ability to organize the movement of the arc attachment along the electrode, thus ensuring an even distribution of the thermal load and thus achieve long time of continuous operation of the plasma torch. The parameters of the plasma jet of the plasma torch and the single-phase three-phase plasma injector for use in a plasma-chemical unit for production of nano-dispersed materials are described in the paper.

A method to accelerate creation of plasma etch recipes using physics and Bayesian statistics

NASA Astrophysics Data System (ADS)

Chopra, Meghali J.; Verma, Rahul; Lane, Austin; Willson, C. G.; Bonnecaze, Roger T.

2017-03-01

Next generation semiconductor technologies like high density memory storage require precise 2D and 3D nanopatterns. Plasma etching processes are essential to achieving the nanoscale precision required for these structures. Current plasma process development methods rely primarily on iterative trial and error or factorial design of experiment (DOE) to define the plasma process space. Here we evaluate the efficacy of the software tool Recipe Optimization for Deposition and Etching (RODEo) against standard industry methods at determining the process parameters of a high density O2 plasma system with three case studies. In the first case study, we demonstrate that RODEo is able to predict etch rates more accurately than a regression model based on a full factorial design while using 40% fewer experiments. In the second case study, we demonstrate that RODEo performs significantly better than a full factorial DOE at identifying optimal process conditions to maximize anisotropy. In the third case study we experimentally show how RODEo maximizes etch rates while using half the experiments of a full factorial DOE method. With enhanced process predictions and more accurate maps of the process space, RODEo reduces the number of experiments required to develop and optimize plasma processes.

Sensitivity of porcine epidemic diarrhea virus (PEDV) to pH and heat treatment in the presence or absence of porcine plasma.

PubMed

Quist-Rybachuk, G V; Nauwynck, H J; Kalmar, I D

2015-12-31

Emergence of porcine epidemic diarrhea virus (PEDV) resulted in massive neonatal mortality in the North-American and Asian pork industry. Measures to prevent its geographical spread are of utmost importance to safeguard susceptible porcine populations. The major infection route is direct or indirect faecal-oral contact. Adequate biosafety measures should be in place at all levels of the swine production chain, including feed and feed ingredients. Present study aimed to investigate the sensitivity of PEDV to thermal inactivation at neutral and alkaline pH in presence or absence of porcine plasma. Cell culture medium and porcine plasma at different pH (7.2, 9.2, 10.2) and temperature conditions (4 °C, 40 °C, 44 °C, 48 °C) were inoculated to a final titer of 5.5 log10 TCID50 PEDV/ml, incubated for up to 120 min and the residual infectivity was determined by endpoint dilution assay. Irrespective of presence of plasma, PEDV was not sensitive to pH 7.2-10.2 at 4 °C. At moderate temperatures (≥40 °C), both alkaline pH and presence of plasma potentiated thermal inactivation. Inactivation of 8 log10 TCID50/ml plasma within 30 min (8D value<30 min) by moderate pH and temperature would denote potential industrial processing conditions that ensure safety towards PEDV while limiting denaturation of bioactive components. Virus-spiked plasma required heat treatment of 40 °C and alkalinization to pH 9.2 to achieve 8 log10 reduction within such time. At pH 10.2 and 48 °C, the 8D value was 4.6 min in plasma and 15.2 min in MEM. Here we propose heat-alkalinity-time (HAT) pasteurization as a highly efficient method to inactivate PEDV during industrial processing of porcine plasma. Copyright © 2015 Elsevier B.V. All rights reserved.

Disposal of olive mill wastewater with DC arc plasma method.

PubMed

Ibrahimoglu, Beycan; Yilmazoglu, M Zeki

2018-07-01

Olive mill wastewater is an industrial waste, generated as a byproduct of olive oil production process and generally contains components such as organic matter, suspended solids, oil, and grease. Although various methods have been developed to achieve the disposal of this industrial wastewater, due to the low cost, the most common disposal application is the passive storage in the lagoons. The main objective of this study is to reduce pollution parameters in olive mill wastewater and draw water to discharge limits by using plasma technology. Plasma-assisted disposal of olive mill wastewater method could be an alternative disposal technique when considering potential utilization of treated water in agricultural areas and economic value of flammable plasma gas which is the byproduct of disposal process. According to the experimental results, the rates of COD (chemical oxygen demand) and BOD (biological oxygen demand) of olive mill wastewater are decreased by 94.42% and 95.37%, respectively. The dissolved oxygen amount is increased from 0.36 to 6.97 mg/l. In addition, plasma gas with high H 2 content and treated water that can be used in agricultural areas for irrigation are obtained from non-dischargeable wastewater. Copyright © 2018 Elsevier Ltd. All rights reserved.

Plasma-water interactions at atmospheric pressure in a dc microplasma

NASA Astrophysics Data System (ADS)

Patel, Jenish; Němcová, Lucie; Mitra, Somak; Graham, William; Maguire, Paul; Švrček, Vladimir; Mariotti, Davide

2013-09-01

Plasma-liquid interactions generate a variety of chemical species that are very useful for the treatment of many materials and that makes plasma-induced liquid chemistry (PiLC) very attractive for industrial applications. The understanding of plasma-induced chemistry with water can open up a vast range of plasma-activated chemistry in liquid with enormous potential for the synthesis of chemical compounds, nanomaterials synthesis and functionalization. However, this basic understanding of the chemistry occurring at the plasma-liquid interface is still poor. In the present study, different properties of water are analysed when processed by plasma at atmospheric-pressure with different conditions. In particular, pH, temperature and conductivity of water are measured against current and time of plasma processing. We also observed the formation of molecular oxygen (O2) and hydrogen peroxide (H2O2) for the same plasma conditions. The current of plasma processing was found to affect the water properties and the production of hydrogen peroxide in water. The relation between the number of electrons injected from plasma in water and the number of H2O2 molecules was established and based on these results a scenario of reactions channels activated by plasma-water interface is concluded.

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella and Escherichia coli 0157:H7

USDA-ARS?s Scientific Manuscript database

Cross-contamination of fresh produce from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a waterless, zero-contact, chemical-free method for removing pathogens from food-contact surfaces. Cold plasma was tested for its ability to remove biofilms f...

Plasma for electrification of chemical industry: a case study on CO2 reduction

NASA Astrophysics Data System (ADS)

van Rooij, G. J.; Akse, H. N.; Bongers, W. A.; van de Sanden, M. C. M.

2018-01-01

Significant growth of the share of (intermittent) renewable power in the chemical industry is imperative to meet increasingly stricter limits on CO2 exhaust that are being implemented within Europe. This paper aims to evaluate the potential of a plasma process that converts input CO2 into a pure stream of CO to aid in renewable energy penetration in this sector. A realistic process design is constructed to serve as a basis for an economical analysis. The manufacturing cost price of CO is estimated at 1.2 kUS ton-1 CO. A sensitivity analysis shows that separation is the dominant cost factor, so that improving conversion is currently more effective to lower the price than e.g. energy efficiency.

Plasma fractionation issues.

PubMed

Farrugia, Albert; Evers, Theo; Falcou, Pierre-Francois; Burnouf, Thierry; Amorim, Luiz; Thomas, Sylvia

2009-04-01

Procurement and processing of human plasma for fractionation of therapeutic proteins or biological medicines used in clinical practice is a multi-billion dollar international trade. Together the private sector and public sector (non-profit) provide large amounts of safe and effective therapeutic plasma proteins needed worldwide. The principal therapeutic proteins produced by the dichotomous industry include gamma globulins or immunoglobulins (including pathogen-specific hyperimmune globulins, such as hepatitis B immune globulins) albumin, factor VIII and Factor IX concentrates. Viral inactivation, principally by solvent detergent and other processes, has proven highly effective in preventing transmission of enveloped viruses, viz. HBV, HIV, and HCV.

An Industry Viewpoint on Electron Energy Distribution Function Control

NASA Astrophysics Data System (ADS)

Ventzek, Peter

2011-10-01

It is trite to note that plasmas play a key role in industrial technology. Lighting, laser, film coating and now medical technology require plasma science for their sustenance. One field stands out by virtue of its economic girth and impact. Semiconductor manufacturing and process science enabling its decades of innovation owe significant debt to progress in low temperature plasma science. Today, technology requires atomic level control from plasmas. Mere layers of atoms delineate good and bad device performance. While plasma sources meet nanoscale specifications over 100s cm scale dimensions, achieving atomic level control from plasmas is hindered by the absence of direct control of species velocity distribution functions. EEDF control translates to precise control of species flux and velocities at surfaces adjacent to the plasma. Electron energy distribution function (eedf) control is a challenge that, if successfully met, will have a huge impact on nanoscale device manufacturing. This lunchtime talk will attempt to provide context to the research advances presented at this Workshop. Touched on will be areas of new opportunity and the risks associated with missing these opportunities.

Active Plasma Resonance Spectroscopy: Evaluation of a fluiddynamic-model of the planar multipole resonance probe using functional analytic methods

NASA Astrophysics Data System (ADS)

Friedrichs, Michael; Brinkmann, Ralf Peter; Oberrath, Jens

2016-09-01

Measuring plasma parameters, e.g. electron density and electron temperature, is an important procedure to verify the stability and behavior of a plasma process. For this purpose the multipole resonance probe (MRP) represents a satisfying solution to measure the electron density. However the influence of the probe on the plasma through its physical presence makes it unattractive for some processes in industrial application. A solution to combine the benefits of the spherical MRP with the ability to integrate the probe into the plasma reactor is introduced by the planar model of the MRP. By coupling the model of the cold plasma with the maxwell equations for electrostatics an analytical model for the admittance of the plasma is derivated, adjusted to cylindrical geometry and solved analytically for the planar MRP using functional analytic methods.

Interaction of both plasmas in CO2 laser-MAG hybrid welding of carbon steel

NASA Astrophysics Data System (ADS)

Kutsuna, Muneharu; Chen, Liang

2003-03-01

Researches and developments of laser and arc hybrid welding has been curried out since in 1978. Especially, CO2 laser and TIG hybrid welding has been studied for increasing the penetration depth and welding speed. Recently laser and MIG/MAG/Plasma hybrid welding processes have been developed and applied to industries. It was recognized as a new welding process that promote the flexibility of the process for increasing the penetration depth, welding speed and allowable joint gap and improving the quality of the welds. In the present work, CO2 Laser-MAG hybrid welding of carbon steel (SM490) was investigated to make clear the phenomenon and characteristics of hybrid welding process comparing with laser welding and MAG process. The effects of many process parameters such as welding current, arc voltage, welding speed, defocusing distance, laser-to-arc distance on penetration depth, bead shape, spatter, arc stability and plasma formation were investigated in the present work. Especially, the interaction of laser plasma and MAG arc plasma was considered by changing the laser to arc distance (=DLA).

High-Performance Molybdenum Coating by Wire–HVOF Thermal Spray Process

NASA Astrophysics Data System (ADS)

Tailor, Satish; Modi, Ankur; Modi, S. C.

2018-04-01

Coating deposition on many industrial components with good microstructural, mechanical properties, and better wear resistance is always a challenge for the thermal spray community. A number of thermal spray methods are used to develop such promising coatings for many industrial applications, viz. arc spray, flame spray, plasma, and HVOF. All these processes have their own limitations to achieve porous free, very dense, high-performance wear-resistant coatings. In this work, an attempt has been made to overcome this limitation. Molybdenum coatings were deposited on low-carbon steel substrates using wire-high-velocity oxy-fuel (W-HVOF; WH) thermal spray system (trade name HIJET 9610®). For a comparison, Mo coatings were also fabricated by arc spray, flame spray, plasma spray, and powder-HVOF processes. As-sprayed coatings were analyzed using x-ray diffraction, scanning electron microscopy for phase, and microstructural analysis, respectively. Coating microhardness, surface roughness, and porosity were also measured. Adhesion strength and wear tests were conducted to determine the mechanical and wear properties of the as-sprayed coatings. Results show that the coatings deposited by W-HVOF have better performance in terms of microstructural, mechanical, and wear resistance properties, in comparison with available thermal spray process (flame spray and plasma spray).

Plasmachemical degradation of azo dyes by humid air plasma: Yellow Supranol 4 GL, Scarlet Red Nylosan F3 GL and industrial waste.

PubMed

Abdelmalek, F; Gharbi, S; Benstaali, B; Addou, A; Brisset, J L

2004-05-01

A recent non-thermal plasma technique (i.e., a gliding arc discharge which generates reactive species at atmospheric pressure) is tested for pollution abatement of dyes dispersed in synthetic solutions and industrial effluents. Yellow Supranol 4 GL (YS) and Scarlet Red Nylosan F3 GL (SRN) are toxic synthetic dyes widely used in the Algerian textile industry and frequently present in liquid wastes of manufacture plants. Classical removal treatment processes are not efficient enough, so that the presence of dyes in liquid effluents may cause serious environmental problems, in connection with reusing waste waters for irrigation. The degradation processes achieved by the oxidising species formed in the plasma are followed by UV/VIS spectroscopy and by chemical oxygen demand measurements. They are almost complete (i.e., 92.5% for YS and 90% for dilute SRN) and rapidly follow pseudo-first-order laws, with overall estimated rate constants 3 x 10(-4) and 4 x 10(-4)s-1 for YS and SRN, respectively. The degradation rate constant for the industrial mixture (i.e., k = 1.45 x 10(-3)s-1) is a mean value for two consecutive steps (210(-3) and 6 x 10(-5)s-1) measured at the absorption peaks of the major constituent dyes, YS and SRN.

Hollow-Cathode Source Generates Plasma

NASA Technical Reports Server (NTRS)

Deininger, W. D.; Aston, G.; Pless, L. C.

1989-01-01

Device generates argon, krypton, or xenon plasma via thermionic emission and electrical discharge within hollow cathode and ejects plasma into surrounding vacuum. Goes from cold start up to full operation in less than 5 s after initial application of power. Exposed to moist air between operations without significant degradation of starting and running characteristics. Plasma generated by electrical discharge in cathode barrel sustained and aided by thermionic emission from emitter tube. Emitter tube does not depend on rare-earth oxides, making it vulnerable to contamination by exposure to atmosphere. Device modified for use as source of plasma in laboratory experiments or industrial processes.

Online quality monitoring of welding processes by means of plasma optical spectroscopy

NASA Astrophysics Data System (ADS)

Ferrara, Michele; Ancona, Antonio; Lugara, Pietro M.; Sibilano, Michele

2000-02-01

An optical monitoring system for the welding process has been developed; it is based on the study of the optical emission of the welding plasma plume, created during the welding of stainless steels and other iron-based materials. In the first approach a continuous wave CO2 laser of 2500-Watt maximum power, available at the INFM Research Unit labs in Bari University, has been used as welding source. A detailed spectroscopic study of the visible and UV welding plasma emission has been carried out; many transition lines corresponding to the elements composing the material to be welded have been found. By means of an appropriate selection of these lines and suitable algorithms, the electronic temperature of the plasma plume has been calculated and its evolution recorded as a function of several welding parameters. The behavior of the registered signal has resulted to be correlated to the welded joint quality. These findings have allowed to design and assemble a portable, non-intrusive and real-time welding quality optical sensor which has been successfully tested for laser welding of metals in different geometrical configurations; it has been capable of detecting a wide range of weld defects normally occurring during industrial laser metal-working. This sensor has also been tested in arc welding industrial processes (TIG) with promising results.

Practical Aspects of Suspension Plasma Spray for Thermal Barrier Coatings on Potential Gas Turbine Components

NASA Astrophysics Data System (ADS)

Ma, X.; Ruggiero, P.

2018-04-01

Suspension plasma spray (SPS) process has attracted extensive efforts and interests to produce fine-structured and functional coatings. In particular, thermal barrier coatings (TBCs) applied by SPS process gain increasing interest due to its potential for superior thermal protection of gas turbine hot sections as compared to conventional TBCs. Unique columnar architectures and nano- and submicrometric grains in the SPS-TBC demonstrated some advantages of thermal shock durability, low thermal conductivity, erosion resistance and strain-tolerant microstructure. This work aimed to look into some practical aspects of SPS processing for TBC applications before it becomes a reliable industry method. The spray capability and applicability of SPS process to achieve uniformity thickness and microstructure on curved substrates were emphasized in designed spray trials to simulate the coating fabrication onto industrial turbine parts with complex configurations. The performances of the SPS-TBCs were tested in erosion, falling ballistic impact and indentational loading tests as to evaluate SPS-TBC performances in simulated turbine service conditions. Finally, a turbine blade was coated and sectioned to verify SPS sprayability in multiple critical sections. The SPS trials and test results demonstrated that SPS process is promising for innovative TBCs, but some challenges need to be addressed and resolved before it becomes an economic and capable industrial process, especially for complex turbine components.

Plasma processes in water under effect of short duration pulse discharges

NASA Astrophysics Data System (ADS)

Gurbanov, Elchin

2013-09-01

It is very important to get a clear water without any impurities and bacteria by methods, that don't change the physical and chemical indicators of water now. In this article the plasma processes during the water treatment by strong electric fields and short duration pulse discharges are considered. The crown discharge around an electrode with a small radius of curvature consists of plasma leader channels with a high conductivity, where the thermo ionization processes and UV-radiation are taken place. Simultaneously the partial discharges around potential electrode lead to formation of atomic oxygen and ozone. The spark discharge arises, when plasma leader channels cross the all interelectrode gap, where the temperature and pressure are strongly grown. As a result the shock waves and dispersing liquid streams in all discharge gap are formed. The plasma channels extend, pressure inside it becomes less than hydrostatic one and the collapse and UV-radiation processes are started. The considered physical processes can be successfully used as a basis for development of pilot-industrial installations for conditioning of drinking water and to disinfecting of sewage.

EDITORIAL: Non-thermal plasma-assisted fuel conversion for green chemistry Non-thermal plasma-assisted fuel conversion for green chemistry

NASA Astrophysics Data System (ADS)

Nozaki, Tomohiro; Gutsol, Alexander

2011-07-01

This special issue is based on the symposium on Non-thermal Plasma Assisted Fuel Conversion for Green Chemistry, a part of the 240th ACS National Meeting & Exposition held in Boston, MA, USA, 22-26 August 2010. Historically, the Division of Fuel Chemistry of the American Chemical Society (ACS) has featured three plasma-related symposia since 2000, and has launched special issues in Catalysis Today on three occasions: 'Catalyst Preparation using Plasma Technologies', Fall Meeting, Washington DC, USA, 2000. Special issue in Catalysis Today 72 (3-4) with 12 peer-reviewed articles. 'Plasma Technology and Catalysis', Spring Meeting, New Orleans, LA, USA, 2003. Special issue in Catalysis Today 89 (1-2) with more than 30 peer-reviewed articles. 'Utilization of Greenhouse Gases II' (partly focused on plasma-related technologies), Spring Meeting, Anaheim, CA, USA, 2004. Special issue in Catalysis Today 98 (4) with 25 peer-reviewed articles. This time, selected presentations are published in this Journal of Physics D: Applied Physics special issue. An industrial material and energy conversion technology platform is established on thermochemical processes including various catalytic reactions. Existing industry-scale technology is already well established; nevertheless, further improvement in energy efficiency and material saving has been continuously demanded. Drastic reduction of CO2 emission is also drawing keen attention with increasing recognition of energy and environmental issues. Green chemistry is a rapidly growing research field, and frequently highlights renewable bioenergy, bioprocesses, solar photocatalysis of water splitting, and regeneration of CO2 into useful chemicals. We would also like to emphasize 'plasma catalysis' of hydrocarbon resources as an important part of the innovative next-generation green technologies. The peculiarity of non-thermal plasma is that it can generate reactive species almost independently of reaction temperature. Plasma-generated reactive species are used to initiate chemical reactions at unexpectedly lower temperatures than conventional thermochemical reactions, leading to non-equilibrium product distribution or creating unconventional reaction pathways. When non-thermal plasma is combined with catalysts, a synergistic effect is frequently observed. Such unique properties of non-thermal plasma are expected to contribute excellent control over process parameters that meet the need for energy saving, environment protection, and material preservation. This special issue consists of eleven peer-reviewed papers including two invited publications. Professors Alexander Fridman and Alexander Rabinovich from Drexel University, and Dr Gutsol from the Chevron Energy Technology Company present a critical review of various industry-oriented practical plasma fuel conversion processes. Professor Richard Mallinson from University of Oklahoma describes his recent project on E85 (85%-ethanol/15%-gasoline) upgrading using non-thermal plasma and catalyst hybrid reactor, and highlights the synergistic effect on fuel conversion processes. Other papers focus on plasma/catalyst hybrid reactions for methane dry (CO2) reforming, plasma synthesis of carbon suboxide polymer from CO, the gas-to-liquid (GTL) process using a non-thermal plasma-combined micro-chemical reactor, and molecular beam characterization of plasma-generated reactive species. Much research regarding plasma catalysis is ongoing worldwide, but there is plenty of room for further development of plasma fuel processing, which could eventually provide a viable and flexible solution in future energy and material use. Finally, we would like to thank all symposium participants for their active discussion. We appreciate the sponsorship of the Division of Fuel Chemistry of the American Chemical Society. We express special thanks to the program chair of the Fuel Chemistry Division, Professor Chang-jun Liu at Tianjin University, for his dedication to the success of the symposium. We particularly express our appreciation to the Editorial Board of Journal of Physics D: Applied Physics for publication of the special issue.

Planar Multipol-Resonance-Probe: A Spectral Kinetic Approach

NASA Astrophysics Data System (ADS)

Friedrichs, Michael; Gong, Junbo; Brinkmann, Ralf Peter; Oberrath, Jens; Wilczek, Sebastian

2016-09-01

Measuring plasma parameters, e.g. electron density and electron temperature, is an important procedure to verify the stability and behavior of a plasma process. For this purpose the multipole resonance probe (MRP) represents a satisfying solution to measure the electron density. However the influence of the probe on the plasma through its physical presence makes it unattractive for some processes in industrial application. A solution to combine the benefits of the spherical MRP with the ability to integrate the probe into the plasma reactor is introduced by the planar model of the MRP (pMRP). Introducing the spectral kinetic formalism leads to a reduced simulation-circle compared to particle-in-cell simulations. The model of the pMRP is implemented and first simulation results are presented.

Computing the complex : Dusty plasmas in the presence of magnetic fields and UV radiation

NASA Astrophysics Data System (ADS)

Land, V.

2007-12-01

About 90% of the visible universe is plasma. Interstellar clouds, stellar cores and atmospheres, the Solar wind, the Earth's ionosphere, polar lights, and lightning are all plasma; ionized gases, consisting of electrons, ions, and neutrals. Not only many industries, like the microchip and solar cell industry, but also future fusion power stations, rely heavily on the use of plasma. More and more, home appliances include plasma technologies, like compact fluorescent light sources, and plasma screens. Dust particles, which can disrupt plasma processes, enter these plasmas, through chemical reactions in the plasma, or through interactions between plasma and walls. For instance, during microchip fabrication, dust particles can destroy the tiny, nanometre-sized structures on the surface of these chips. On the other hand, dust particles orbiting Young Stellar Objects coagulate and form the seeds of planets. In order to understand fundamental processes, such as planet formation, or to optimize industrial plasma processes, a thorough description of dusty plasma is necessary. Dust particles immersed in plasma collect ions and electrons from the plasma and charge up electrically. Therefore, the presence of dust changes plasma, while at the same time many forces start acting on the dust. Therefore, the dust and plasma become coupled, making dusty plasma a very complex medium to describe, in which many length and time scales play a role, from the Debye length to the length of the electrodes, and from the inverse plasma frequencies to the dust transport times. Using a self-consistent fluid model, we simulate these multi-scale dusty plasmas in radio frequency discharges under micro-gravity. We show that moderate non-linear scattering of ions by the dust particles is the most important aspect in the calculation of the ion drag force. This force is also responsible for the formation of a dust-free 'void' in dusty plasma under micro-gravity, caused by ions moving from the centre of the void towards the outside of the discharge. The void thus requires electron-impact ionizations inside the void. The electrons gain the energy for these ionizations inside the dust cloud surrounding the void, however. We show that a growing electron temperature gradient is responsible for the transport of electron energy from the surrounding dust cloud into the void. An axial magnetic field in the discharge magnetizes the electrons. This changes the ambipolar flux of ions through the bulk of the discharge. The ion drag force changes, resulting in a differently shaped void and faster void formation. Experiments in a direct current discharge, show a response of both dust and plasma in the E?B direction, when a magnetic field is applied. The dust response consists of two phases: an initial fast phase, and a later, slow phase. Using a Particle-In-Cell plus Monte Carlo model, we show that the dust charge can be reduced by adding a flux of ultraviolet radiation. A source of ultraviolet light can thus serve as a tool to manipulate dusty plasmas, but might also be important for the coagulation of dust particles around young stars and planet formation in general.

Application of Atmospheric-Pressure Microwave Line Plasma for Low Temperature Process

NASA Astrophysics Data System (ADS)

Suzuki, Haruka; Nakano, Suguru; Itoh, Hitoshi; Sekine, Makoto; Hori, Masaru; Toyoda, Hirotaka

2015-09-01

Atmospheric pressure (AP) plasmas have been given much attention because of its high cost benefit and a variety of possibilities for industrial applications. In various kinds of plasma production technique, pulsed-microwave discharge plasma using slot antenna is attractive due to its ability of high-density and stable plasma production. In this plasma source, however, size of the plasma has been limited up to a few cm in length due to standing wave inside a waveguide. To solve this, we have proposed a newly-developed AP microwave plasma source that utilizes not standing wave but travelling wave. By using this plasma source, spatially-uniform AP line plasma with 40 cm in length was realized by pure helium discharge in 60 cm slot and with nitrogen gas additive of 1%. Furthermore, gas temperature as low as 400 K was realized in this device. In this study, as an example of low temperature processes, hydrophilic treatment of PET films was performed. Processing speed increased with pulse frequency and a water contact angle of ~20° was easily obtained within 5 s with no thermal damage to the substrate. To evaluate treatment-uniformity of long line length, PET films were treated by 90 cm slot-antenna plasma and uniform treatment performance was confirmed.

High power lasers: Sources, laser-material interactions, high excitations, and fast dynamics in laser processing and industrial applications; Proceedings of the Meeting, The Hague, Netherlands, Mar. 31-Apr. 3, 1987

NASA Technical Reports Server (NTRS)

Kreutz, E. W. (Editor); Quenzer, Alain (Editor); Schuoecker, Dieter (Editor)

1987-01-01

The design and operation of high-power lasers for industrial applications are discussed in reviews and reports. Topics addressed include the status of optical technology in the Netherlands, laser design, the deposition of optical energy, laser diagnostics, nonmetal processing, and energy coupling and plasma formation. Consideration is given to laser-induced damage to materials, fluid and gas flow dynamics, metal processing, and manufacturing. Graphs, diagrams, micrographs, and photographs are provided.

Electron-Beam Atomic Spectroscopy for In Situ Measurements of Melt Composition for Refractory Metals: Analysis of Fundamental Physics and Plasma Models

NASA Astrophysics Data System (ADS)

Gasper, Paul Joseph; Apelian, Diran

2015-04-01

Electron-beam (EB) melting is used for the processing of refractory metals, such as Ta, Nb, Mo, and W. These metals have high value and are critical to many industries, including the semiconductor, aerospace, and nuclear industries. EB melting can also purify secondary feedstock, enabling the recovery and recycling of these materials. Currently, there is no method for measuring melt composition in situ during EB melting. Optical emission spectroscopy of the plasma generated by EB impact with vapor above the melt, a technique here termed electron-beam atomic spectroscopy, can be used to measure melt composition in situ, allowing for analysis of melt dynamics, facilitating improvement of EB melting processes and aiding recycling and recovery of these critical and high-value metals. This paper reviews the physics of the plasma generation by EB impact by characterizing the densities and energies of electrons, ions, and neutrals, and describing the interactions between them. Then several plasma models are introduced and their suitability to this application analyzed. Lastly, a potential method for calibration-free composition measurement is described and the challenges for implementation addressed.

Monoclonal antibodies specific to heat-treated porcine blood.

PubMed

Raja Nhari, Raja Mohd Hafidz; Hamid, Muhajir; Rasli, Nurmunirah Mohamad; Omar, Abdul Rahman; El Sheikha, Aly Farag; Mustafa, Shuhaimi

2016-05-01

Porcine blood is potentially being utilized in food as a binder, gelling agent, emulsifier or colorant. However, for certain communities, the usage of animal blood in food is strictly prohibited owing to religious concerns and health reasons. This study reports the development of monoclonal antibodies (MAbs) against heat-treated soluble proteins (HSPs) of autoclaved porcine blood; characterization of MAbs against blood, non-blood and plasma from different animal species using qualitative indirect non-competitive enzyme-linked immunosorbent assay (ELISA); and immunoblotting of antigenic components in HSPs of porcine blood. Fifteen MAbs are specific to heat-treated and raw porcine blood and not cross-reacted with other animal blood and non-blood proteins (meat and non-meat). Twelve MAbs are specific to porcine plasma, while three MAbs specific to porcine plasma are cross-reacted with chicken plasma. Immunoblotting revealed antigenic protein bands (∼60, ∼85-100 and ∼250 kDa) in porcine blood and plasma recognized by the MAbs. Selection of MAbs that recognized 60 kDa HSPs of porcine blood and plasma as novel monoclonal antibodies would be useful for detection of porcine plasma in processed food using the immunoassay method. © 2015 Society of Chemical Industry. © 2015 Society of Chemical Industry.

Environmentally benign semiconductor processing for dielectric etch

NASA Astrophysics Data System (ADS)

Liao, Marci Yi-Ting

Semiconductor processing requires intensive usage of chemicals, electricity, and water. Such intensive resource usage leaves a large impact on the environment. For instance, in Silicon Valley, the semiconductor industry is responsible for 80% of the hazardous waste sites contaminated enough to require government assistance. Research on environmentally benign semiconductor processing is needed to reduce the environmental impact of the semiconductor industry. The focus of this dissertation is on the environmental impact of one aspect of semiconductor processing: patterning of dielectric materials. Plasma etching of silicon dioxide emits perfluorocarbons (PFCs) gases, like C2F6 and CF4, into the atmosphere. These gases are super global warming/greenhouse gases because of their extremely long atmospheric lifetimes and excellent infrared absorption properties. We developed the first inductively coupled plasma (ICP) abatement device for destroying PFCs downstream of a plasma etcher. Destruction efficiencies of 99% and 94% can be obtained for the above mentioned PFCs, by using O 2 as an additive gas. Our results have lead to extensive modeling in academia as well as commercialization of the ICP abatement system. Dielectric patterning of hi-k materials for future device technology brings different environment challenges. The uncertainty of the hi-k material selection and the patterning method need to be addressed. We have evaluated the environmental impact of three different dielectric patterning methods (plasma etch, wet etch and chemical-mechanical polishing), as well as, the transistor device performances associated with the patterning methods. Plasma etching was found to be the most environmentally benign patterning method, which also gives the best device performance. However, the environmental concern for plasma etching is the possibility of cross-contamination from low volatility etch by-products. Therefore, mass transfer in a plasma etcher for a promising hi-k dielectric material, ZrO2, was studied. A novel cross-contamination sampling technique was developed, along with a mass transfer model.

Process for ultra smooth diamond coating on metals and uses thereof

NASA Technical Reports Server (NTRS)

Vohra, Yogesh K. (Inventor); Catledge, Shane A. (Inventor)

2001-01-01

The present invention provides a new process to deposit well adhered ultra smooth diamond films on metals by adding nitrogen gas to the methane/hydrogen plasma created by a microwave discharge. Such diamond coating process is useful in tribological/wear resistant applications in bio-implants, machine tools, and magnetic recording industry.

Quantum cascade laser based monitoring of CF{sub 2} radical concentration as a diagnostic tool of dielectric etching plasma processes

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hübner, M.; Lang, N.; Röpcke, J.

2015-01-19

Dielectric etching plasma processes for modern interlevel dielectrics become more and more complex by the introduction of new ultra low-k dielectrics. One challenge is the minimization of sidewall damage, while etching ultra low-k porous SiCOH by fluorocarbon plasmas. The optimization of this process requires a deeper understanding of the concentration of the CF{sub 2} radical, which acts as precursor in the polymerization of the etch sample surfaces. In an industrial dielectric etching plasma reactor, the CF{sub 2} radical was measured in situ using a continuous wave quantum cascade laser (cw-QCL) around 1106.2 cm{sup −1}. We measured Doppler-resolved ro-vibrational absorption lines andmore » determined absolute densities using transitions in the ν{sub 3} fundamental band of CF{sub 2} with the aid of an improved simulation of the line strengths. We found that the CF{sub 2} radical concentration during the etching plasma process directly correlates to the layer structure of the etched wafer. Hence, this correlation can serve as a diagnostic tool of dielectric etching plasma processes. Applying QCL based absorption spectroscopy opens up the way for advanced process monitoring and etching controlling in semiconductor manufacturing.« less

Plasma-assisted combustion technology for NOx reduction in industrial burners.

PubMed

Lee, Dae Hoon; Kim, Kwan-Tae; Kang, Hee Seok; Song, Young-Hoon; Park, Jae Eon

2013-10-01

Stronger regulations on nitrogen oxide (NOx) production have recently promoted the creation of a diverse array of technologies for NOx reduction, particularly within the combustion process, where reduction is least expensive. In this paper, we discuss a new combustion technology that can reduce NOx emissions within industrial burners to single-digit parts per million levels without employing exhaust gas recirculation or other NOx reduction mechanisms. This new technology uses a simple modification of commercial burners, such that they are able to perform plasma-assisted staged combustion without altering the outer configuration of the commercial reference burner. We embedded the first-stage combustor within the head of the commercial reference burner, where it operated as a reformer that could host a partial oxidation process, producing hydrogen-rich reformate or synthesis gas product. The resulting hydrogen-rich flow then ignited and stabilized the combustion flame apart from the burner rim. Ultimately, the enhanced mixing and removal of hot spots with a widened flame area acted as the main mechanisms of NOx reduction. Because this plasma burner acted as a low NOx burner and was able to reduce NOx by more than half compared to the commercial reference burner, this methodology offers important cost-effective possibilities for NOx reduction in industrial applications.

Process Control in Production-Worthy Plasma Doping Technology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Winder, Edmund J.; Fang Ziwei; Arevalo, Edwin

2006-11-13

As the semiconductor industry continues to scale devices of smaller dimensions and improved performance, many ion implantation processes require lower energy and higher doses. Achieving these high doses (in some cases {approx}1x1016 ions/cm2) at low energies (<3 keV) while maintaining throughput is increasingly challenging for traditional beamline implant tools because of space-charge effects that limit achievable beam density at low energies. Plasma doping is recognized as a technology which can overcome this problem. In this paper, we highlight the technology available to achieve process control for all implant parameters associated with modem semiconductor manufacturing.

Optoelectronic properties of Black-Silicon generated through inductively coupled plasma (ICP) processing for crystalline silicon solar cells

NASA Astrophysics Data System (ADS)

Hirsch, Jens; Gaudig, Maria; Bernhard, Norbert; Lausch, Dominik

2016-06-01

The optoelectronic properties of maskless inductively coupled plasma (ICP) generated black silicon through SF6 and O2 are analyzed by using reflection measurements, scanning electron microscopy (SEM) and quasi steady state photoconductivity (QSSPC). The results are discussed and compared to capacitively coupled plasma (CCP) and industrial standard wet chemical textures. The ICP process forms parabolic like surface structures in a scale of 500 nm. This surface structure reduces the average hemispherical reflection between 300 and 1120 nm up to 8%. Additionally, the ICP texture shows a weak increase of the hemispherical reflection under tilted angles of incidence up to 60°. Furthermore, we report that the ICP process is independent of the crystal orientation and the surface roughness. This allows the texturing of monocrystalline, multicrystalline and kerf-less wafers using the same parameter set. The ICP generation of black silicon does not apply a self-bias on the silicon sample. Therefore, the silicon sample is exposed to a reduced ion bombardment, which reduces the plasma induced surface damage. This leads to an enhancement of the effective charge carrier lifetime up to 2.5 ms at 1015 cm-3 minority carrier density (MCD) after an atomic layer deposition (ALD) with Al2O3. Since excellent etch results were obtained already after 4 min process time, we conclude that the ICP generation of black silicon is a promising technique to substitute the industrial state of the art wet chemical textures in the solar cell mass production.

Synthesis and Characterization of Titanium Slag from Ilmenite by Thermal Plasma Processing

NASA Astrophysics Data System (ADS)

Samal, Sneha

2016-09-01

Titanium rich slag has emerged as a raw material for alternative titanium source. Ilmenite contains 42-50% TiO2 as the mineralogical composition depending on the geographical resources. Application of titanium in paper, plastic, pigment and other various industries is increasing day by day. Due to the scarcity of natural raw mineral rutile (TiO2), ilmenite is considered as precursor for the extraction of TiO2. Ilmenite is reduced at the initial stage for the conversion of complex iron oxide into simpler form. Therefore, pre-reduction of ilmenite concentrate is essential to minimize the energy consumption during thermal plasma process. Thermal plasma processing of ilmenite for the production of titania rich slag is considered to be the direct route to meet the current demand of industrial needs of titanium. Titania rich slag contains 70-80% TiO2 as the major component with some other minor impurities, like oxide phases of Si, Al, Cr, Mg, Mn, Ca, etc. Usually titanium is present in tetravalent forms with globular metallic iron in the slag. Titania rich slag undergoes leaching for the removal of iron and transforming the slag into synthetic rutile having 85-95% of TiO2.

Surface pretreatment of plastics with an atmospheric pressure plasma jet - Influence of generator power and kinematics

NASA Astrophysics Data System (ADS)

Moritzer, E.; Leister, C.

2014-05-01

The industrial use of atmospheric pressure plasmas in the plastics processing industry has increased significantly in recent years. Users of this treatment process have the possibility to influence the target values (e.g. bond strength or surface energy) with the help of kinematic and electrical parameters. Until now, systematic procedures have been used with which the parameters can be adapted to the process or product requirements but only by very time-consuming methods. For this reason, the relationship between influencing values and target values will be examined based on the example of a pretreatment in the bonding process with the help of statistical experimental design. Because of the large number of parameters involved, the analysis is restricted to the kinematic and electrical parameters. In the experimental tests, the following factors are taken as parameters: gap between nozzle and substrate, treatment velocity (kinematic data), voltage and duty cycle (electrical data). The statistical evaluation shows significant relationships between the parameters and surface energy in the case of polypropylene. An increase in the voltage and duty cycle increases the polar proportion of the surface energy, while a larger gap and higher velocity leads to lower energy levels. The bond strength of the overlapping bond is also significantly influenced by the voltage, velocity and gap. The direction of their effects is identical with those of the surface energy. In addition to the kinematic influences of the motion of an atmospheric pressure plasma jet, it is therefore especially important that the parameters for the plasma production are taken into account when designing the pretreatment processes.

DAGON: a 3D Maxwell-Bloch code

NASA Astrophysics Data System (ADS)

Oliva, Eduardo; Cotelo, Manuel; Escudero, Juan Carlos; González-Fernández, Agustín.; Sanchís, Alberto; Vera, Javier; Vicéns, Sergio; Velarde, Pedro

2017-05-01

The amplification of UV radiation and high order harmonics (HOH) in plasmas is a subject of raising interest due to its different potential applications in several fields like environment and security (detection at distance), biology, materials science and industry (3D imaging) and atomic and plasma physics (pump-probe experiments). In order to develop these sources, it is necessary to properly understand the amplification process. Being the plasma an inhomogeneous medium which changes with time, it is desirable to have a full time-dependent 3D description of the interaction of UV and XUV radiation with plasmas. For these reasons, at the Instituto de Fusíon Nuclear we have developed DAGON, a 3D Maxwell-Bloch code capable of studying the full spationtemporal structure of the amplification process abovementioned.

Plasma nitriding monitoring reactor: A model reactor for studying plasma nitriding processes using an active screen

NASA Astrophysics Data System (ADS)

Hamann, S.; Börner, K.; Burlacov, I.; Spies, H.-J.; Strämke, M.; Strämke, S.; Röpcke, J.

2015-12-01

A laboratory scale plasma nitriding monitoring reactor (PLANIMOR) has been designed to study the basics of active screen plasma nitriding (ASPN) processes. PLANIMOR consists of a tube reactor vessel, made of borosilicate glass, enabling optical emission spectroscopy (OES) and infrared absorption spectroscopy. The linear setup of the electrode system of the reactor has the advantages to apply the diagnostic approaches on each part of the plasma process, separately. Furthermore, possible changes of the electrical field and of the heat generation, as they could appear in down-scaled cylindrical ASPN reactors, are avoided. PLANIMOR has been used for the nitriding of steel samples, achieving similar results as in an industrial scale ASPN reactor. A compact spectrometer using an external cavity quantum cascade laser combined with an optical multi-pass cell has been applied for the detection of molecular reaction products. This allowed the determination of the concentrations of four stable molecular species (CH4, C2H2, HCN, and NH3). With the help of OES, the rotational temperature of the screen plasma could be determined.

On improved understanding of plasma-chemical processes in complex low-temperature plasmas

NASA Astrophysics Data System (ADS)

Röpcke, Jürgen; Loffhagen, Detlef; von Wahl, Eric; Nave, Andy S. C.; Hamann, Stephan; van Helden, Jean-Piere H.; Lang, Norbert; Kersten, Holger

2018-05-01

Over the last years, chemical sensing using optical emission spectroscopy (OES) in the visible spectral range has been combined with methods of mid infrared laser absorption spectroscopy (MIR-LAS) in the molecular fingerprint region from 3 to 20 μm, which contains strong rotational-vibrational absorption bands of a large variety of gaseous species. This optical approach established powerful in situ diagnostic tools to study plasma-chemical processes of complex low-temperature plasmas. The methods of MIR-LAS enable to detect stable and transient molecular species in ground and excited states and to measure the concentrations and temperatures of reactive species in plasmas. Since kinetic processes are inherent to discharges ignited in molecular gases, high time resolution on sub-second timescales is frequently desired for fundamental studies as well as for process monitoring in applied research and industry. In addition to high sensitivity and good temporal resolution, the capacity for broad spectral coverage enabling multicomponent detection is further expanding the use of OES and MIR-LAS techniques. Based on selected examples, this paper reports on recent achievements in the understanding of complex low-temperature plasmas. Recently, a link with chemical modeling of the plasma has been provided, which is the ultimate objective for a better understanding of the chemical and reaction kinetic processes occurring in the plasma. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02

DOE Office of Scientific and Technical Information (OSTI.GOV)

Caplan, M.; Olstad, R.; Jory, H.

2017-09-08

This project was a collaborative effort to develop and demonstrate a new millimeter microwave assisted chemical vapor deposition(CVD) process for manufacturing large diamond disks with greatly reduced processing times and costs from those now available. In the CVD process, carbon based gases (methane) and hydrogen are dissociated into plasma using microwave discharge and then deposited layer by layer as polycrystalline diamond onto a substrate. The available low frequency (2.45GHz) microwave sources used elsewhere (De Beers) result in low density plasmas and low deposition rates: 4 inch diamond disks take 6-8 weeks to process. The new system developed in this projectmore » uses a high frequency 30GHz Gyrotron as the microwave source and a quasi-optical CVD chamber resulting in a much higher density plasma which greatly reduced the diamond processing times (1-2 weeks)« less

Self-consistent simulation of high-frequency driven plasma sheaths

NASA Astrophysics Data System (ADS)

Shihab, Mohammed; Eremin, Denis; Mussenbrock, Thomas; Brinkmann, Ralf

2011-10-01

Low pressure capacitively coupled plasmas are widely used in plasma processing and microelectronics industry. Understanding the dynamics of the boundary sheath is a fundamental problem. It controls the energy and angular distribution of ions bombarding the electrode, which in turn affects the surface reaction rate and the profile of microscopic features. In this contribution, we investigate the dynamics of plasma boundary sheaths by means of a kinetic self-consistent model, which is able to resolve the ion dynamics. Asymmetric sheath dynamics is observed for the intermediate RF regime, i.e., in the regime where the ion plasma frequency is equal to the driving frequency. The ion inertia causes an additional phase difference between the expansion and the contraction phase of the plasma sheath and an asymmetry for the ion energy distribution bimodal shape. A comparison with experimental results and particle in cell simulations is performed. Low pressure capacitively coupled plasmas are widely used in plasma processing and microelectronics industry. Understanding the dynamics of the boundary sheath is a fundamental problem. It controls the energy and angular distribution of ions bombarding the electrode, which in turn affects the surface reaction rate and the profile of microscopic features. In this contribution, we investigate the dynamics of plasma boundary sheaths by means of a kinetic self-consistent model, which is able to resolve the ion dynamics. Asymmetric sheath dynamics is observed for the intermediate RF regime, i.e., in the regime where the ion plasma frequency is equal to the driving frequency. The ion inertia causes an additional phase difference between the expansion and the contraction phase of the plasma sheath and an asymmetry for the ion energy distribution bimodal shape. A comparison with experimental results and particle in cell simulations is performed. The financial support from the Federal Ministry of Education and Research within the frame of the project ``Plasma-Technology-Grid'' and the support of the DFG via the collaborative research center SFB-TR87 is gratefully acknowledged.

Contributions to process monitoring by laser-induced breakdown spectroscopy

NASA Astrophysics Data System (ADS)

Rusak, David Alexander

1998-12-01

When a pulsed laser of sufficient energy and pulse duration is brought to a focus, multi-photon ionization creates free electrons in the focal volume. These electrons are accelerated in a process known as inverse Bremsstrahlung and cause collisional ionization of species in the focal volume. More charge carriers are produced and the process continues for the duration of the laser pulse. The manifestation of this process is a visible spark or plasma which typically lasts for tens of microseconds. This laser-induced plasma can serve as a source in an atomic emission experiment. Because the composition of the plasma is determined in large part by the environment in which it forms, elements in the laser target can be determined spectroscopically. The goal of a laser-induced breakdown spectroscopy (LIBS) experiment is to establish a relationship between the concentration of an element of interest in the target and the intensity of light emitted from the laser-induced plasma at a wavelength characteristic of that element. Because LIBS requires only optical access to the sample and can perform elemental determinations in solids, liquids, or gases with little sample preparation, there is interest in using it as an on-line technique for process monitoring in a number of industrial applications. However, before the technique becomes useful in industrial applications, many issues regarding instrumentation and data analysis need to be addressed in the lab. The first two chapters of this dissertation provide, respectively, the basics of the atomic emission experiment and a background of laser-induced breakdown spectroscopy. The next two chapters examine the effect of target water content on the laser-induced plasma and the use of LIBS for analysis of aqueous samples. Chapter 5 describes construction of a fiber optic LIBS probe and its use to study temporal electron number density evolution in plasmas formed on different metals. Chapter 6 is a study of excitation, vibrational, and rotational temperatures in plasmas formed by ultraviolet and infrared laser beams. The last chapter is a brief assessment of classification software for analysis of LIBS data and a discussion of future work.

Atomic precision etch using a low-electron temperature plasma

NASA Astrophysics Data System (ADS)

Dorf, L.; Wang, J.-C.; Rauf, S.; Zhang, Y.; Agarwal, A.; Kenney, J.; Ramaswamy, K.; Collins, K.

2016-03-01

Sub-nm precision is increasingly being required of many critical plasma etching processes in the semiconductor industry. Accurate control over ion energy and ion/radical composition is needed during plasma processing to meet these stringent requirements. Described in this work is a new plasma etch system which has been designed with the requirements of atomic precision plasma processing in mind. In this system, an electron sheet beam parallel to the substrate surface produces a plasma with an order of magnitude lower electron temperature Te (~ 0.3 eV) and ion energy Ei (< 3 eV without applied bias) compared to conventional radio-frequency (RF) plasma technologies. Electron beam plasmas are characterized by higher ion-to-radical fraction compared to RF plasmas, so a separate radical source is used to provide accurate control over relative ion and radical concentrations. Another important element in this plasma system is low frequency RF bias capability which allows control of ion energy in the 2-50 eV range. Presented in this work are the results of etching of a variety of materials and structures performed in this system. In addition to high selectivity and low controllable etch rate, an important requirement of atomic precision etch processes is no (or minimal) damage to the remaining material surface. It has traditionally not been possible to avoid damage in RF plasma processing systems, even during atomic layer etch. The experiments for Si etch in Cl2 based plasmas in the aforementioned etch system show that damage can be minimized if the ion energy is kept below 10 eV. Layer-by-layer etch of Si is also demonstrated in this etch system using electrical and gas pulsing.

Atmospheric pressure plasma jet's characterization and surface wettability driven by neon transformer

NASA Astrophysics Data System (ADS)

Elfa, R. R.; Nafarizal, N.; Ahmad, M. K.; Sahdan, M. Z.; Soon, C. F.

2017-03-01

Atmospheric pressure plasma driven by Neon transformer power supply argon is presented in this paper. Atmospheric pressure plasma system has attracted researcher interest over low pressure plasma as it provides a flexibility process, cost-efficient, portable device and vacuum-free device. Besides, another golden key of this system is the wide promising application in the field of work cover from industrial and engineering to medical. However, there are still numbers of fundamental investigation that are necessary such as device configuration, gas configuration and its effect. Dielectric barrier discharge which is also known as atmospheric pressure plasma discharge is created when there is gas ionization process occur which enhance the movement of atom and electron and provide energetic particles. These energetic particles can provide modification and cleaning property to the sample surface due to the bombardment of the high reactive ion and radicals to the sample surface. In order to develop atmospheric pressure plasma discharge, a high voltage and high frequency power supply is needed. In this work, we used a neon transformer power supply as the power supply. The flow of the Ar is feed into 10 mm cylinder quartz tube with different treatment time in order to investigate the effect of the plasma discharge. The analysis of each treatment time is presented by optical emission spectroscopy (OES) and water contact angle (WCA) measurement. The increase of gas treatment time shows increases intensity of reactive Ar and reduces the angle of water droplets in water contact angle. Treatment time of 20 s microslide glass surface shows that the plasma needle discharges have modified the sample surface from hydrophilic surface to superhydrophilic surface. Thus, this leads to another interesting application in reducing sample surface adhesion to optimize productivity in the industry of paintings, semiconductor and more.

Plasma under control: Advanced solutions and perspectives for plasma flux management in material treatment and nanosynthesis

NASA Astrophysics Data System (ADS)

Baranov, O.; Bazaka, K.; Kersten, H.; Keidar, M.; Cvelbar, U.; Xu, S.; Levchenko, I.

2017-12-01

Given the vast number of strategies used to control the behavior of laboratory and industrially relevant plasmas for material processing and other state-of-the-art applications, a potential user may find themselves overwhelmed with the diversity of physical configurations used to generate and control plasmas. Apparently, a need for clearly defined, physics-based classification of the presently available spectrum of plasma technologies is pressing, and the critically summary of the individual advantages, unique benefits, and challenges against key application criteria is a vital prerequisite for the further progress. To facilitate selection of the technological solutions that provide the best match to the needs of the end user, this work systematically explores plasma setups, focusing on the most significant family of the processes—control of plasma fluxes—which determine the distribution and delivery of mass and energy to the surfaces of materials being processed and synthesized. A novel classification based on the incorporation of substrates into plasma-generating circuitry is also proposed and illustrated by its application to a wide variety of plasma reactors, where the effect of substrate incorporation on the plasma fluxes is emphasized. With the key process and material parameters, such as growth and modification rates, phase transitions, crystallinity, density of lattice defects, and others being linked to plasma and energy fluxes, this review offers direction to physicists, engineers, and materials scientists engaged in the design and development of instrumentation for plasma processing and diagnostics, where the selection of the correct tools is critical for the advancement of emerging and high-performance applications.

Pathogen Inactivated Plasma Concentrated: Preparation and Uses

DTIC Science & Technology

2004-09-01

REPORT DATE 01 SEP 2004 2 . REPORT TYPE N/A 3. DATES COVERED - 4. TITLE AND SUBTITLE Pathogen Inactivated Plasma Concentrated: Preparation...Concentrated: Preparation and Uses 22 - 2 RTO-MP-HFM-109 Results: Both UVC and ozone yielded a PPV logarithmic reduction factor (LRF) of 6, for a...technology to be marketed; the industry name is Plas+SD [ 2 ]. This process functions by attacking the lipid sheathes that surround enveloped viruses

Generation of low-temperature air plasma for food processing

NASA Astrophysics Data System (ADS)

Stepanova, Olga; Demidova, Maria; Astafiev, Alexander; Pinchuk, Mikhail; Balkir, Pinar; Turantas, Fulya

2015-11-01

The project is aimed at developing a physical and technical foundation of generating plasma with low gas temperature at atmospheric pressure for food industry needs. As known, plasma has an antimicrobial effect on the numerous types of microorganisms, including those that cause food spoilage. In this work an original experimental setup has been developed for the treatment of different foods. It is based on initiating corona or dielectric-barrier discharge in a chamber filled with ambient air in combination with a certain helium admixture. The experimental setup provides various conditions of discharge generation (including discharge gap geometry, supply voltage, velocity of gas flow, content of helium admixture in air and working pressure) and allows for the measurement of the electrical discharge parameters. Some recommendations on choosing optimal conditions of discharge generation for experiments on plasma food processing are developed.

[Plasma fractionation in the world: current status].

PubMed

Burnouf, T

2007-05-01

From 22 to 25 million liters of plasma are fractionated yearly in about 70 fractionation plants, either private or government-owned, mainly located in industrialized countries, and with a capacity ranging from 50000 to three million liters. In an increasingly global environment, the plasma industry has recently gone through a major consolidation phase that has seen mergers and acquisitions, and has led to the closure of a number of small plants in Europe. Currently, some fifteen countries are involved into contract plasma fractionation programs to ensure a supply of plasma-derived medicinal products. The majority of the plasma for fractionation is obtained by automated plasmapheresis, the remaining (recovered plasma) being prepared from whole blood as a by-product of red cell production. Plasma for fractionation should be produced, and controlled following well established procedures to meet the strict quality requirements set by regulatory authorities and fractionators. The plasma fractionation technology still relies heavily on the cold ethanol fractionation process, but has been improved by the introduction of modern chromatographic purification methods, and efficient viral inactivation and removal treatments, ensuring quality and safety to a large portfolio of fractionated plasma products. The safety of these products with regards to the risk of transmission of variant Creutzfeldt-Jakob disease seems to be provided, based on current scientific data, by extensive removal of the infectious agent during certain fractionation steps. The leading plasma product is now the intravenous immunoglobulin G, which has replaced factor VIII and albumin in this role. The supply of plasma products (most specifically coagulation products and immunoglobulin) at an affordable price and in sufficient quantity remains an issue; the problem is particularly acute in developing countries, as the switch to recombinant factor VIII in rich countries has not solved the supply issue and has even led to an increase of the mean price of plasma-derived factor VIII to the developing world. In the last few years, the plasma fractionation industry has improved greatly, and should remain essential in the years to come for the procurement of many essential medicines.

Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes

PubMed Central

Yang, Jie; McArdle, Conor; Daniels, Stephen

2014-01-01

A new data dimension-reduction method, called Internal Information Redundancy Reduction (IIRR), is proposed for application to Optical Emission Spectroscopy (OES) datasets obtained from industrial plasma processes. For example in a semiconductor manufacturing environment, real-time spectral emission data is potentially very useful for inferring information about critical process parameters such as wafer etch rates, however, the relationship between the spectral sensor data gathered over the duration of an etching process step and the target process output parameters is complex. OES sensor data has high dimensionality (fine wavelength resolution is required in spectral emission measurements in order to capture data on all chemical species involved in plasma reactions) and full spectrum samples are taken at frequent time points, so that dynamic process changes can be captured. To maximise the utility of the gathered dataset, it is essential that information redundancy is minimised, but with the important requirement that the resulting reduced dataset remains in a form that is amenable to direct interpretation of the physical process. To meet this requirement and to achieve a high reduction in dimension with little information loss, the IIRR method proposed in this paper operates directly in the original variable space, identifying peak wavelength emissions and the correlative relationships between them. A new statistic, Mean Determination Ratio (MDR), is proposed to quantify the information loss after dimension reduction and the effectiveness of IIRR is demonstrated using an actual semiconductor manufacturing dataset. As an example of the application of IIRR in process monitoring/control, we also show how etch rates can be accurately predicted from IIRR dimension-reduced spectral data. PMID:24451453

Treatment of industrial exhaust gases by a dielectric barrier discharge

NASA Astrophysics Data System (ADS)

Schmidt, Michael; Hołub, Marcin; Jõgi, Indrek; Sikk, Martin

2016-08-01

Volatile organic compounds (VOCs) in industrial exhaust gases were treated by a dielectric barrier discharge (DBD) operated with two different mobile power supplies. Together with the plasma source various gas diagnostics were used, namely fourier transform infrared (FTIR) spectroscopy, flame ionization detector (FID) and GC-MS. The analysis revealed that some exhaust gases consist of a rather complex mixture of hydrocarbons and inorganic compounds and also vary in pollutants concentration and flow rate. Thus, analysis of removal efficiencies and byproduct concentrations is more demanding than under laboratory conditions. This contribution presents the experimental apparatus used under the harsh conditions of industrial exhaust systems as well as the mobile power source used. Selected results obtained in a shale oil processing plant, a polymer concrete production facility and a yacht hull factory are discussed. In the case of total volatile organic compounds in oil processing units, up to 60% were removed at input energy of 21-37 J/L when the concentrations were below 500 mg/m3. In the yacht hull factory up to 74% of styrene and methanol were removed at specific input energies around 300 J/L. In the polymer concrete production site 195 ppm of styrene were decomposed with the consumption of 1.8 kJ/L. These results demonstrate the feasibility of plasma assisted methods for treatment of VOCs in the investigated production processes but additional analysis is needed to improve the energy efficiency. Contribution to the topical issue "6th Central European Symposium on Plasma Chemistry (CESPC-6)", edited by Nicolas Gherardi, Ester Marotta and Cristina Paradisi

Plasma nitriding monitoring reactor: A model reactor for studying plasma nitriding processes using an active screen

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hamann, S., E-mail: hamann@inp-greifswald.de; Röpcke, J.; Börner, K.

2015-12-15

A laboratory scale plasma nitriding monitoring reactor (PLANIMOR) has been designed to study the basics of active screen plasma nitriding (ASPN) processes. PLANIMOR consists of a tube reactor vessel, made of borosilicate glass, enabling optical emission spectroscopy (OES) and infrared absorption spectroscopy. The linear setup of the electrode system of the reactor has the advantages to apply the diagnostic approaches on each part of the plasma process, separately. Furthermore, possible changes of the electrical field and of the heat generation, as they could appear in down-scaled cylindrical ASPN reactors, are avoided. PLANIMOR has been used for the nitriding of steelmore » samples, achieving similar results as in an industrial scale ASPN reactor. A compact spectrometer using an external cavity quantum cascade laser combined with an optical multi-pass cell has been applied for the detection of molecular reaction products. This allowed the determination of the concentrations of four stable molecular species (CH{sub 4}, C{sub 2}H{sub 2}, HCN, and NH{sub 3}). With the help of OES, the rotational temperature of the screen plasma could be determined.« less

Cellulose microfibril deposition: coordinated activity at the plant plasma membrane.

PubMed

Lindeboom, J; Mulder, B M; Vos, J W; Ketelaar, T; Emons, A M C

2008-08-01

Plant cell wall production is a membrane-bound process. Cell walls are composed of cellulose microfibrils, embedded inside a matrix of other polysaccharides and glycoproteins. The cell wall matrix is extruded into the existing cell wall by exocytosis. This same process also inserts the cellulose synthase complexes into the plasma membrane. These complexes, the nanomachines that produce the cellulose microfibrils, move inside the plasma membrane leaving the cellulose microfibrils in their wake. Cellulose microfibril angle is an important determinant of cell development and of tissue properties and as such relevant for the industrial use of plant material. Here, we provide an integrated view of the events taking place in the not more than 100 nm deep area in and around the plasma membrane, correlating recent results provided by the distinct field of plant cell biology. We discuss the coordinated activities of exocytosis, endocytosis, and movement of cellulose synthase complexes while producing cellulose microfibrils and the link of these processes to the cortical microtubules.

PLASMA DISCHARGE ELECTRODE FOR ELECTROSTATIC PRECIPITATORS - PHASE II

EPA Science Inventory

Electrostatic precipitators are widely used for removal of particulate matter form boiler exhaust gases. The EPA promulgation of National emission Standards for Hazardous Air Pollutants (NESHAP) from Industrial, Commercial and Institutional Boilers and Process Heater will req...

First-principles modeling of laser-matter interaction and plasma dynamics in nanosecond pulsed laser shock processing

NASA Astrophysics Data System (ADS)

Zhang, Zhongyang; Nian, Qiong; Doumanidis, Charalabos C.; Liao, Yiliang

2018-02-01

Nanosecond pulsed laser shock processing (LSP) techniques, including laser shock peening, laser peen forming, and laser shock imprinting, have been employed for widespread industrial applications. In these processes, the main beneficial characteristic is the laser-induced shockwave with a high pressure (in the order of GPa), which leads to the plastic deformation with an ultrahigh strain rate (105-106/s) on the surface of target materials. Although LSP processes have been extensively studied by experiments, few efforts have been put on elucidating underlying process mechanisms through developing a physics-based process model. In particular, development of a first-principles model is critical for process optimization and novel process design. This work aims at introducing such a theoretical model for a fundamental understanding of process mechanisms in LSP. Emphasis is placed on the laser-matter interaction and plasma dynamics. This model is found to offer capabilities in predicting key parameters including electron and ion temperatures, plasma state variables (temperature, density, and pressure), and the propagation of the laser shockwave. The modeling results were validated by experimental data.

Study of supersonic plasma technology jets

NASA Astrophysics Data System (ADS)

Selezneva, Svetlana; Gravelle, Denis; Boulos, Maher; van de Sanden, Richard; Schram, Dc

2001-10-01

Recently some new techniques using remote thermal plasma for thin film deposition and plasma chemistry processes were developed. These techniques include PECVD of diamonds, diamond-like and polymer films; a-C:H and a-Si:H films. The latter are of especial interest because of their applications for solar cell production industry. In remote plasma deposition, thermal plasma is formed by means of one of traditional plasma sources. The chamber pressure is reduced with the help of continuous pumping. In that way the flow is accelerated up to the supersonic speed. The plasma expansion is controlled using a specific torch nozzle design. To optimize the deposition process detailed knowledge about the gas dynamic structure of the jet and chemical kinetics mechanisms is required. In the paper, we show how the flow pattern and the character of the deviations from local thermodynamic equilibrium differs in plasmas generated by different plasma sources, such as induction plasma torch, traditional direct current arc and cascaded arc. We study the effects of the chamber pressure, nozzle design and carrier gas on the resulting plasma properties. The analysis is performed by means of numerical modeling using commercially available FLUENT program with incorporated user-defined subroutines for two-temperature model. The results of continuum mechanics approach are compared with that of the kinetic Monte Carlo method and with the experimental data.

Plasma modification of starch.

PubMed

Zhu, Fan

2017-10-01

Plasma is a medium of unbound negative and positive particles with the overall electrical charge being roughly zero. Non-thermal plasma processing is an emerging green technology with great potential to improve the quality and microbial safety of various food materials. Starch is a major component of many food products and is an important ingredient for food and other industries. There has been increasing interest in utilizing plasma to modify the functionalities of starch through interactions with reactive species. This mini-review summarises the impact of plasma on composition, chemical and granular structures, physicochemical properties, and uses of starch. Structure-function relationships of starch components as affected by plasma modifications are discussed. Effect of plasma on the properties of wheat flour, which is a typical example of starch based complex food systems, is also reviewed. Future research directions on how to better utilise plasma to improve the functionalities of starch are suggested. Copyright © 2017 Elsevier Ltd. All rights reserved.

Design Considerations in Capacitively Coupled Plasmas

NASA Astrophysics Data System (ADS)

Song, Sang-Heon; Ventzek, Peter; Ranjan, Alok

2015-11-01

Microelectronics industry has driven transistor feature size scaling from 10-6 m to 10-9 m during the past 50 years, which is often referred to as Moore's law. It cannot be overstated that today's information technology would not have been so successful without plasma material processing. One of the major plasma sources for the microelectronics fabrication is capacitively coupled plasmas (CCPs). The CCP reactor has been intensively studied and developed for the deposition and etching of different films on the silicon wafer. As the feature size gets to around 10 nm, the requirement for the process uniformity is less than 1-2 nm across the wafer (300 mm). In order to achieve the desired uniformity, the hardware design should be as precise as possible before the fine tuning of process condition is applied to make it even better. In doing this procedure, the computer simulation can save a significant amount of resources such as time and money which are critical in the semiconductor business. In this presentation, we compare plasma properties using a 2-dimensional plasma hydrodynamics model for different kinds of design factors that can affect the plasma uniformity. The parameters studied in this presentation include chamber accessing port, pumping port, focus ring around wafer substrate, and the geometry of electrodes of CCP.

UV excimer laser and low temperature plasma treatments of polyamide materials

NASA Astrophysics Data System (ADS)

Yip, Yiu Wan Joanne

Polyamides have found widespread application in various industrial sectors, for example, they are used in apparel, home furnishings and similar uses. However, the requirements for high quality performance products are continually increasing and these promote a variety of surface treatments for polymer modification. UV excimer laser and low temperature plasma treatments are ideally suited for polyamide modification because they can change the physical and chemical properties of the material without affecting its bulk features. This project aimed to study the modification of polyamides by UV excimer laser irradiation and low temperature plasma treatment. The morphological changes in the resulting samples were analysed by scanning electron microscopy (SEM) and tapping mode atomic force microscopy (TM-AFM). The chemical modifications were studied by x-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and chemical force microscopy (CFM). Change in degree of crystallinity was examined by differential scanning calorimetry (DSC). After high-fluence laser irradiation, topographical results showed that ripples of micrometer size form on the fibre surface. By contrast, sub-micrometer size structures form on the polyamide surface when the applied laser energy is well below its ablation threshold. After high-fluence laser irradiation, chemical studies showed that the surface oxygen content of polyamide is reduced. A reverse result is obtained with low-fluence treatment. The DSC result showed no significant change in degree of crystallinity in either high-fluence or low-fluence treated samples. The same modifications in polyamide surfaces were studied after low temperature plasma treatment with oxygen, argon or tetrafluoromethane gas. The most significant result was that the surface oxygen content of polyamide increased after oxygen and argon plasma treatments. Both treatments induced many hydroxyl (-OH) and carboxylic acid (-COOH) functional groups, which increased water absorption. However, after tetrafluoromethane plasma treatment it was found that the -CF, -CF2 and -CF3 groups were introduced to the polyamide surface and this enhanced the hydrophobicity of the fabric. Suggested explanations are given of the mechanisms that produce the structure of the polyamide after the processes of laser irradiation (both high- and low-fluence) and plasma treatment. The fundamental approach used in modelling was considered the temperature profile of the material during the treatment. The development of high-fluence induced structures was caused by elevated temperatures in the subsurface volume and preexisting stress caused by fiber extrusion. The structure formation under LF laser irradiation was determined by thermal effect accompanied by the optical phenomenon of interference. Ripple structures formed by plasma were closely related to physical or chemical etching. Possible applications of plasma and laser technologies in the textile and clothing industries are considered. Oxygen plasma seems to be the best candidate to improve the wettability of the fabric, while tetrafluoromethane plasma can be applied to produce a water repellent surface. Surface treatments including CF4 plasma, high-fluence and low-fluence laser treatments produce a deeper color in disperse dyed fabrics using the same amount of dyestuff as chemicals like leveling agents and dyestuff can be reduced during the textile manufacturing process. UV laser and low temperature plasma modification processes are promising techniques for polymer/fabric surface modification and have industrial potential as they are environmentally friendly dry processes which do not involve any solvents.

Modeling of low pressure plasma sources for microelectronics fabrication

NASA Astrophysics Data System (ADS)

Agarwal, Ankur; Bera, Kallol; Kenney, Jason; Likhanskii, Alexandre; Rauf, Shahid

2017-10-01

Chemically reactive plasmas operating in the 1 mTorr-10 Torr pressure range are widely used for thin film processing in the semiconductor industry. Plasma modeling has come to play an important role in the design of these plasma processing systems. A number of 3-dimensional (3D) fluid and hybrid plasma modeling examples are used to illustrate the role of computational investigations in design of plasma processing hardware for applications such as ion implantation, deposition, and etching. A model for a rectangular inductively coupled plasma (ICP) source is described, which is employed as an ion source for ion implantation. It is shown that gas pressure strongly influences ion flux uniformity, which is determined by the balance between the location of plasma production and diffusion. The effect of chamber dimensions on plasma uniformity in a rectangular capacitively coupled plasma (CCP) is examined using an electromagnetic plasma model. Due to high pressure and small gap in this system, plasma uniformity is found to be primarily determined by the electric field profile in the sheath/pre-sheath region. A 3D model is utilized to investigate the confinement properties of a mesh in a cylindrical CCP. Results highlight the role of hole topology and size on the formation of localized hot-spots. A 3D electromagnetic plasma model for a cylindrical ICP is used to study inductive versus capacitive power coupling and how placement of ground return wires influences it. Finally, a 3D hybrid plasma model for an electron beam generated magnetized plasma is used to understand the role of reactor geometry on plasma uniformity in the presence of E  ×  B drift.

Supersonic Plasma Spray Deposition of CoNiCrAlY Coatings on Ti-6Al-4V Alloy

NASA Astrophysics Data System (ADS)

Caliari, F. R.; Miranda, F. S.; Reis, D. A. P.; Essiptchouk, A. M.; Filho, G. P.

2017-06-01

Plasma spray is a versatile technology used for production of environmental and thermal barrier coatings, mainly in the aerospace, gas turbine, and automotive industries, with potential application in the renewable energy industry. New plasma spray technologies have been developed recently to produce high-quality coatings as an alternative to the costly low-pressure plasma-spray process. In this work, we studied the properties of as-sprayed CoNiCrAlY coatings deposited on Ti-6Al-4V substrate with smooth surface ( R a = 0.8 μm) by means of a plasma torch operating in supersonic regime at atmospheric pressure. The CoNiCrAlY coatings were evaluated in terms of their surface roughness, microstructure, instrumented indentation, and phase content. Static and dynamic depositions were investigated to examine their effect on coating characteristics. Results show that the substrate surface velocity has a major influence on the coating properties. The sprayed CoNiCrAlY coatings exhibit low roughness ( R a of 5.7 μm), low porosity (0.8%), excellent mechanical properties ( H it = 6.1 GPa, E it = 155 GPa), and elevated interface toughness (2.4 MPa m1/2).

Submillimeter Spectroscopic Study of Semiconductor Processing Plasmas

NASA Astrophysics Data System (ADS)

Helal, Yaser H.

Plasmas used for manufacturing processes of semiconductor devices are complex and challenging to characterize. The development and improvement of plasma processes and models rely on feedback from experimental measurements. Current diagnostic methods are not capable of measuring absolute densities of plasma species with high resolution without altering the plasma, or without input from other measurements. At pressures below 100 mTorr, spectroscopic measurements of rotational transitions in the submillimeter/terahertz (SMM) spectral region are narrow enough in relation to the sparsity of spectral lines that absolute specificity of measurement is possible. The frequency resolution of SMM sources is such that spectral absorption features can be fully resolved. Processing plasmas are a similar pressure and temperature to the environment used to study astrophysical species in the SMM spectral region. Many of the molecular neutrals, radicals, and ions present in processing plasmas have been studied in the laboratory and their absorption spectra have been cataloged or are in the literature for the purpose of astrophysical study. Recent developments in SMM devices have made its technology commercially available for applications outside of specialized laboratories. The methods developed over several decades in the SMM spectral region for these laboratory studies are directly applicable for diagnostic measurements in the semiconductor manufacturing industry. In this work, a continuous wave, intensity calibrated SMM absorption spectrometer was developed as a remote sensor of gas and plasma species. A major advantage of intensity calibrated rotational absorption spectroscopy is its ability to determine absolute concentrations and temperatures of plasma species from first principles without altering the plasma environment. An important part of this work was the design of the optical components which couple 500 - 750 GHz radiation through a commercial inductively coupled plasma chamber. The measurement of transmission spectra was simultaneously fit for background and absorption signal. The measured absorption signal was used to calculate absolute densities and temperatures of polar species. Measurements of molecular species were demonstrated for inductively coupled plasmas.

Scalable graphene production from ethanol decomposition by microwave argon plasma torch

NASA Astrophysics Data System (ADS)

Melero, C.; Rincón, R.; Muñoz, J.; Zhang, G.; Sun, S.; Perez, A.; Royuela, O.; González-Gago, C.; Calzada, M. D.

2018-01-01

A fast, efficient and simple method is presented for the production of high quality graphene on a large scale by using an atmospheric pressure plasma-based technique. This technique allows to obtain high quality graphene in powder in just one step, without the use of neither metal catalysts and nor specific substrate during the process. Moreover, the cost for graphene production is significantly reduced since the ethanol used as carbon source can be obtained from the fermentation of agricultural industries. The process provides an additional benefit contributing to the revalorization of waste in the production of a high-value added product like graphene. Thus, this work demonstrates the features of plasma technology as a low cost, efficient, clean and environmentally friendly route for production of high-quality graphene.

Non-thermal plasma technologies: new tools for bio-decontamination.

PubMed

Moreau, M; Orange, N; Feuilloley, M G J

2008-01-01

Bacterial control and decontamination are crucial to industrial safety assessments. However, most recently developed materials are not compatible with standard heat sterilization treatments. Advanced oxidation processes, and particularly non-thermal plasmas, are emerging and promising technologies for sanitation because they are both efficient and cheap. The applications of non-thermal plasma to bacterial control remain poorly known for several reasons: this technique was not developed for biological applications and most of the literature is in the fields of physics and chemistry. Moreover, the diversity of the devices and complexity of the plasmas made any general evaluation of the potential of the technique difficult. Finally, no experimental equipment for non-thermal plasma sterilization is commercially available and reference articles for microbiologists are rare. The present review aims to give an overview of the principles of action and applications of plasma technologies in biodecontamination.

Final Technical Report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alexander Fridman

2005-06-01

This DOE project DE-FC36-04GO14052 ''Plasma Pilot Plant Test for Treating VOC Emissions from Wood Products Plants'' was conducted by Drexel University in cooperation with Georgia-Pacific (G-P) and Kurchatov Institute (KI). The objective of this project was to test the Plasma Pilot Plant capabilities in wood industry. The final goal of the project was to replace the current state-of-the-art, regenerative thermal oxidation (RTO) technology by Low-Temperature Plasma Technology (LTPT) in paper and wood industry for Volatile Organic Components (VOC) destruction in High Volume Low Concentration (HVLC) vent emissions. MetPro Corporation joined the team as an industrial partner from the environmental controlmore » business and a potential leader for commercialization. Concurrent Technology Corporation (CTC) has a separate contract with DOE for this technology evaluation. They prepared questionnaires for comparison of this technology and RTO, and made this comparison. These data are presented in this report along with the description of the technology itself. Experiments with the pilot plant were performed with average plasma power up to 3.6 kW. Different design of the laboratory and pilot plant pulsed coronas, as well as different analytical methods revealed many new peculiarities of the VOC abatement process. The work reported herein describes the experimental results for the VOCs removal efficiency with respect to energy consumption, residence time, water effect and initial concentration.« less

Modeling RF-induced Plasma-Surface Interactions with VSim

NASA Astrophysics Data System (ADS)

Jenkins, Thomas G.; Smithe, David N.; Pankin, Alexei Y.; Roark, Christine M.; Stoltz, Peter H.; Zhou, Sean C.-D.; Kruger, Scott E.

2014-10-01

An overview of ongoing enhancements to the Plasma Discharge (PD) module of Tech-X's VSim software tool is presented. A sub-grid kinetic sheath model, developed for the accurate computation of sheath potentials near metal and dielectric-coated walls, enables the physical effects of DC and RF sheath dynamics to be included in macroscopic-scale plasma simulations that need not explicitly resolve sheath scale lengths. Sheath potential evolution, together with particle behavior near the sheath (e.g. sputtering), can thus be simulated in complex, experimentally relevant geometries. Simulations of RF sheath-enhanced impurity production near surfaces of the C-Mod field-aligned ICRF antenna are presented to illustrate the model; impurity mitigation techniques are also explored. Model extensions to capture the physics of secondary electron emission and of multispecies plasmas are summarized, together with a discussion of improved tools for plasma chemistry and IEDF/EEDF visualization and modeling. The latter tools are also highly relevant for commercial plasma processing applications. Ultimately, we aim to establish VSimPD as a robust, efficient computational tool for modeling fusion and industrial plasma processes. Supported by U.S. DoE SBIR Phase I/II Award DE-SC0009501.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Moritzer, E., E-mail: elmar.moritzer@ktp.upb.de; Leister, C., E-mail: elmar.moritzer@ktp.upb.de

The industrial use of atmospheric pressure plasmas in the plastics processing industry has increased significantly in recent years. Users of this treatment process have the possibility to influence the target values (e.g. bond strength or surface energy) with the help of kinematic and electrical parameters. Until now, systematic procedures have been used with which the parameters can be adapted to the process or product requirements but only by very time-consuming methods. For this reason, the relationship between influencing values and target values will be examined based on the example of a pretreatment in the bonding process with the help ofmore » statistical experimental design. Because of the large number of parameters involved, the analysis is restricted to the kinematic and electrical parameters. In the experimental tests, the following factors are taken as parameters: gap between nozzle and substrate, treatment velocity (kinematic data), voltage and duty cycle (electrical data). The statistical evaluation shows significant relationships between the parameters and surface energy in the case of polypropylene. An increase in the voltage and duty cycle increases the polar proportion of the surface energy, while a larger gap and higher velocity leads to lower energy levels. The bond strength of the overlapping bond is also significantly influenced by the voltage, velocity and gap. The direction of their effects is identical with those of the surface energy. In addition to the kinematic influences of the motion of an atmospheric pressure plasma jet, it is therefore especially important that the parameters for the plasma production are taken into account when designing the pretreatment processes.« less

Plasma Shield for In-Air and Under-Water Beam Processes

NASA Astrophysics Data System (ADS)

Hershcovitch, Ady

2007-11-01

As the name suggests, the Plasma Shield is designed to chemically and thermally shield a target object by engulfing an area subjected to beam treatment with inert plasma. The shield consists of a vortex-stabilized arc that is employed to shield beams and workpiece area of interaction from atmospheric or liquid environment. A vortex-stabilized arc is established between a beam generating device (laser, ion or electron gun) and the target object. The arc, which is composed of a pure noble gas (chemically inert), engulfs the interaction region and shields it from any surrounding liquids like water or reactive gases. The vortex is composed of a sacrificial gas or liquid that swirls around and stabilizes the arc. In current art, many industrial processes like ion material modification by ion implantation, dry etching, and micro-fabrication, as well as, electron beam processing, like electron beam machining and electron beam melting is performed exclusively in vacuum, since electron guns, ion guns, their extractors and accelerators must be kept at a reasonably high vacuum, and since chemical interactions with atmospheric gases adversely affect numerous processes. Various processes involving electron ion and laser beams can, with the Plasma Shield be performed in practically any environment. For example, electron beam and laser welding can be performed under water, as well as, in situ repair of ship and nuclear reactor components. The plasma shield results in both thermal (since the plasma is hotter than the environment) and chemical shielding. The latter feature brings about in-vacuum process purity out of vacuum, and the thermal shielding aspect results in higher production rates. Recently plasma shielded electron beam welding experiments were performed resulting in the expected high quality in-air electron beam welding. Principle of operation and experimental results are to be discussed.

Application of atmospheric solution precursor plasma spray to photocatalytic devices for small and medium industries in developing countries

NASA Astrophysics Data System (ADS)

Kindole, Dickson; Ando, Yasutaka

2017-01-01

For development of a functional film deposition process with high deposition rate, as a basic study, TiO2 films were deposited by atmospheric solution precursor plasma spray (ASPPS) process. Ethanol-diluted titanium tetraisobutoxide [TTIB: Ti(OC4H9)4] was used as a feedstock. To achieve a high plasma thermal energy at a low discharge power, N2-dominant Ar/N2 as the plasma working gas was used, for film deposition at various deposition distances. Consequently, photocatalytic TiO2 with a rutile/anatase mixture film structure was deposited evenly in this case. By conducting methylene blue decomposition and wettability tests, photocatalytic properties of the film were confirmed. When a TiO2 film was applied to photocatalytic dye-sensitized solar cells (DSSCs), the cells generated an electromotive force of 0.143V oc, which is close to those of commercial DSSCs. From these results, the ASPPS process was found to have high potential for high rate functional film deposition and was cost effective, making it suitable for developing countries.

Optimizing Compliance and Thermal Conductivity of Plasma Sprayed Thermal Barrier Coatings via Controlled Powders and Processing Strategies

NASA Astrophysics Data System (ADS)

Tan, Yang; Srinivasan, Vasudevan; Nakamura, Toshio; Sampath, Sanjay; Bertrand, Pierre; Bertrand, Ghislaine

2012-09-01

The properties and performance of plasma-sprayed thermal barrier coatings (TBCs) are strongly dependent on the microstructural defects, which are affected by starting powder morphology and processing conditions. Of particular interest is the use of hollow powders which not only allow for efficient melting of zirconia ceramics but also produce lower conductivity and more compliant coatings. Typical industrial hollow spray powders have an assortment of densities resulting in masking potential advantages of the hollow morphology. In this study, we have conducted process mapping strategies using a novel uniform shell thickness hollow powder to control the defect microstructure and properties. Correlations among coating properties, microstructure, and processing reveal feasibility to produce highly compliant and low conductivity TBC through a combination of optimized feedstock and processing conditions. The results are presented through the framework of process maps establishing correlations among process, microstructure, and properties and providing opportunities for optimization of TBCs.

PREFACE: 12th High-Tech Plasma Processes Conference (HTPP-12)

NASA Astrophysics Data System (ADS)

Gleizes, Alain; Ghedini, Emanuele; Gherardi, Matteo; Sanibondi, Paolo; Dilecce, Giorgio

2012-12-01

The High-Tech Plasma Processes - 12th European Plasma Conference (HTPP-12) was held in Bologna (Italy) on 24-29 June 2012. The conference series started in 1990 as a thermal plasma conference and gradually expanded to include other topic fields as well. Now the High-Tech Plasma Processes - European Plasma Conference (HTPP) is a bi-annual international conference based in Europe with topics encompassing the whole area of plasma processing science. The aim of the conference is to bring different scientific communities together, facilitate the contacts between science, technology and industry and provide a platform for the exploration of both fundamental topics and new applications of plasmas. Thanks to the efforts of the conference chairman, Professor Vittorio Colombo and of the co-chair, Professor Piero Favia, a well balanced participation from both the communities of thermal and nonthermal plasma researchers was achieved; this resulted in just about 196 attendees from 39 countries, with 8 plenary and 15 invited talks, plus 50 oral and 140 poster contributions. This volume of Journal of Physics: Conference Series gathers papers from regular contributions of HTPP-12; each contribution submitted for publication has been peer reviewed and the Editors are very grateful to the referees for their careful support in improving the original manuscripts. In the end, 39 manuscripts were accepted for publication, covering different topics of plasma processing science: from plasma fundamentals and modelling to source design and process diagnostics, from nanomaterial synthesis to surface modification, from waste treatment to plasma applications in a liquid environment. It is an honour to present this volume of Journal of Physics: Conference Series and we deeply thank the authors for their enthusiastic and high-grade contribution. Finally, we would like to thank the conference chairmen, the members of the steering committee, the international scientific committee, the local organizing committee, the organizing secretariat and the financial support from the conference sponsors that allowed the success of HTPP-12. The Editors of the HTPP 12 Proceedings Professor Alain Gleizes (head of the ISC) Dr Emanuele Ghedini Dr Matteo Gherardi Dr Paolo Sanibondi Dr Giorgio Dilecce Bologna, 30 October 2012

Introduction to Particle Acceleration in the Cosmos

NASA Technical Reports Server (NTRS)

Gallagher, D. L.; Horwitz, J. L.; Perez, J.; Quenby, J.

2005-01-01

Accelerated charged particles have been used on Earth since 1930 to explore the very essence of matter, for industrial applications, and for medical treatments. Throughout the universe nature employs a dizzying array of acceleration processes to produce particles spanning twenty orders of magnitude in energy range, while shaping our cosmic environment. Here, we introduce and review the basic physical processes causing particle acceleration, in astrophysical plasmas from geospace to the outer reaches of the cosmos. These processes are chiefly divided into four categories: adiabatic and other forms of non-stochastic acceleration, magnetic energy storage and stochastic acceleration, shock acceleration, and plasma wave and turbulent acceleration. The purpose of this introduction is to set the stage and context for the individual papers comprising this monograph.

Photocatalytic Anatase TiO2 Thin Films on Polymer Optical Fiber Using Atmospheric-Pressure Plasma.

PubMed

Baba, Kamal; Bulou, Simon; Choquet, Patrick; Boscher, Nicolas D

2017-04-19

Due to the undeniable industrial advantages of low-temperature atmospheric-pressure plasma processes, such as low cost, low temperature, easy implementation, and in-line process capabilities, they have become the most promising next-generation candidate system for replacing thermal chemical vapor deposition or wet chemical processes for the deposition of functional coatings. In the work detailed in this article, photocatalytic anatase TiO 2 thin films were deposited at a low temperature on polymer optical fibers using an atmospheric-pressure plasma process. This method overcomes the challenge of forming crystalline transition metal oxide coatings on polymer substrates by using a dry and up-scalable method. The careful selection of the plasma source and the titanium precursor, i.e., titanium ethoxide with a short alkoxy group, allowed the deposition of well-adherent, dense, and crystalline TiO 2 coatings at low substrate temperature. Raman and XRD investigations showed that the addition of oxygen to the precursor's carrier gas resulted in a further increase of the film's crystallinity. Furthermore, the films deposited in the presence of oxygen exhibited a better photocatalytic activity toward methylene blue degradation assumedly due to their higher amount of photoactive {101} facets.

Structurally Integrated Coatings for Wear and Corrosion (SICWC): Arc Lamp, InfraRed (IR) Thermal Processing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mackiewicz-Ludtka, G.; Sebright, J.

2007-12-15

The primary goal of this Cooperative Research and Development Agreement (CRADA) betwe1311 UT-Battelle (Contractor) and Caterpillar Inc. (Participant) was to develop the plasma arc lamp (PAL), infrared (IR) thermal processing technology 1.) to enhance surface coating performance by improving the interfacial bond strength between selected coatings and substrates; and 2.) to extend this technology base for transitioning of the arc lamp processing to the industrial Participant. Completion of the following three key technical tasks (described below) was necessary in order to accomplish this goal. First, thermophysical property data sets were successfully determined for composite coatings applied to 1010 steel substrates,more » with a more limited data set successfully measured for free-standing coatings. These data are necessary for the computer modeling simulations and parametric studies to; A.) simulate PAL IR processing, facilitating the development of the initial processing parameters; and B.) help develop a better understanding of the basic PAL IR fusing process fundamentals, including predicting the influence of melt pool stirring and heat tnmsfar characteristics introduced during plasma arc lamp infrared (IR) processing; Second, a methodology and a set of procedures were successfully developed and the plasma arc lamp (PAL) power profiles were successfully mapped as a function of PAL power level for the ORNL PAL. The latter data also are necessary input for the computer model to accurately simulate PAL processing during process modeling simulations, and to facilitate a better understand of the fusing process fundamentals. Third, several computer modeling codes have been evaluated as to their capabilities and accuracy in being able to capture and simulate convective mixing that may occur during PAL thermal processing. The results from these evaluation efforts are summarized in this report. The intention of this project was to extend the technology base and provide for transitioning of the arc lamp processing to the industrial Participant.« less

Characteristic analysis of surface waves in a sensitive plasma absorption probe

NASA Astrophysics Data System (ADS)

You, Wei; Li, Hong; Tan, Mingsheng; Liu, Wandong

2018-01-01

With features that are simple to construct and a symmetric configuration, the sensitive plasma absorption probe (SPAP) is a dependable probe for industry plasma diagnosis. The minimum peak in the characteristic curve of the coefficient of reflection stems from the surface wave resonance in plasma. We use numerical simulation methods to analyse the details of the excitation and propagation of these surface waves. With this method, the electromagnetic field structure and the resonance and propagation characteristics of the surface wave were analyzed simultaneously using the simulation method. For this SPAP structure, there are three different propagation paths for the propagating plasma surface wave. The propagation characteristic of the surface wave along each path is presented. Its dispersion relation is also calculated. The objective is to complete the relevant theory of the SPAP as well as the propagation process of the plasma surface wave.

Oxidation of limonene using activated carbon modified in dielectric barrier discharge plasma

NASA Astrophysics Data System (ADS)

Glonek, Karolina; Wróblewska, Agnieszka; Makuch, Edyta; Ulejczyk, Bogdan; Krawczyk, Krzysztof; Wróbel, Rafał. J.; Koren, Zvi C.; Michalkiewicz, Beata

2017-10-01

The waste from industrial fruits processing is utilized for the extraction of limonene, a renewable terpene biomass compound obtained from orange peels. This was followed by limonene oxidation, which produces highly useful oxygenated derivatives (carveol, and perillyl alcohol, 1,2-epoxylimonene and its diol). New catalysts were obtained by treating relatively inexpensive commercially available EuroPh and FPV activated carbons with plasma. These catalysts were characterized by the following instrumental methods XRD, sorption of N2 and CO2, SEM, EDS, TEM, XPS, and Raman spectroscopy. The activities of the plasma-treated catalysts were measured in the oxidation of limonene by means of either hydrogen peroxide or t-butyl hydroperoxide as the oxidizing agents. During the oxidation with hydrogen peroxide the new plasma-treated catalysts were more active than their untreated counterparts. This effect was noticeable in the considerable increase in the conversion of limonene. The mechanism explaining this property is proposed, and it takes into account the role of the appropriate functional groups on the surface of the catalysts. This work has shown for the first time that the commercial EuroPh and FPV activated carbons, after having been treated by plasma, are active catalysts for the selective limonene oxidation for the production of value-added industrial products.

Blood safety--a focus on plasma derivatives in Mainland China.

PubMed

Zhu, Y M

2007-01-01

Plasma derivative production in Mainland China can be encapsulated by two figures: 50 years of history and 5000 tons of annually processed source plasma. Demands for albumin, immunoglobulinin and main clotting factors can barely be met, despite a relatively low average usage among China's population of 1.3 billion. The tragedy of contamination among plasma donors in Henan province in the early 1990's has left shadows on the safety of the plasma derivative industry. However, during the last ten years the Chinese government has made great strides forward. The regulation of the entire operation has been strengthened, from law and standard setting and upholding to stricter licensing regulations for plasma centers and fractionators. Public concerns in blood safety are gradually being relieved, and confidence is returning. Nevertheless, the plasma donors and hemophilia patients infected a decade ago by infected blood or plasma products represent a set of severe social and medical problems that the government and society must still deal with.

Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces

NASA Astrophysics Data System (ADS)

Mattson, E. C.; Michalak, D. J.; Veyan, J. F.; Chabal, Y. J.

2017-02-01

Cobalt-iron-boron (CoFeB) thin films are the industry standard for ferromagnetic layers in magnetic tunnel junction devices and are closely related to the relevant surfaces of CoFe-based catalysts. Identifying and understanding the composition of their surfaces under relevant processing conditions is therefore critical. Here we report fundamental studies on the interaction of nitrogen plasma with CoFeB surfaces using infrared spectroscopy, x-ray photoemission spectroscopy, and low energy ion scattering. We find that, upon exposure to nitrogen plasma, clean CoFeB surfaces spontaneously reorganize to form an overlayer comprised of Fe2N3 and BN, with the Co atoms moved well below the surface through a chemically driven process. Subsequent annealing to 400 °C removes nitrogen, resulting in a Fe-rich termination of the surface region.

A critical assessment of in-flight particle state during plasma spraying of YSZ and its implications on coating properties and process reliability

NASA Astrophysics Data System (ADS)

Srinivasan, Vasudevan

Air plasma spray is inherently complex due to the deviation from equilibrium conditions, three dimensional nature, multitude of interrelated (controllable) parameters and (uncontrollable) variables involved, and stochastic variability at different stages. The resultant coatings are complex due to the layered high defect density microstructure. Despite the widespread use and commercial success for decades in earthmoving, automotive, aerospace and power generation industries, plasma spray has not been completely understood and prime reliance for critical applications such as thermal barrier coatings on gas turbines are yet to be accomplished. This dissertation is aimed at understanding the in-flight particle state of the plasma spray process towards designing coatings and achieving coating reliability with the aid of noncontact in-flight particle and spray stream sensors. Key issues such as the phenomena of optimum particle injection and the definition of spray stream using particle state are investigated. Few strategies to modify the microstructure and properties of Yttria Stabilized Zirconia coatings are examined systematically using the framework of process maps. An approach to design process window based on design relevant coating properties is presented. Options to control the process for enhanced reproducibility and reliability are examined and the resultant variability is evaluated systematically at the different stages in the process. The 3D variability due to the difference in plasma characteristics has been critically examined by investigating splats collected from the entire spray footprint.

Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase

NASA Astrophysics Data System (ADS)

von Niessen, Konstantin; Gindrat, Malko

2011-06-01

Plasma spray-physical vapor deposition (PS-PVD) is a low pressure plasma spray technology recently developed by Sulzer Metco AG (Switzerland). Even though it is a thermal spray process, it can deposit coatings out of the vapor phase. The basis of PS-PVD is the low pressure plasma spraying (LPPS) technology that has been well established in industry for several years. In comparison to conventional vacuum plasma spraying (VPS) or low pressure plasma spraying (LPPS), the new proposed process uses a high energy plasma gun operated at a reduced work pressure of 0.1 kPa (1 mbar). Owing to the high energy plasma and further reduced work pressure, PS-PVD is able to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional physical vapor deposition (PVD) technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and electron beam-physical vapor deposition (EB-PVD) coatings. In contrast to EB-PVD, PS-PVD incorporates the vaporized coating material into a supersonic plasma plume. Owing to the forced gas stream of the plasma jet, complex shaped parts such as multi-airfoil turbine vanes can be coated with columnar thermal barrier coatings using PS-PVD. Even shadowed areas and areas which are not in the line of sight of the coating source can be coated homogeneously. This article reports on the progress made by Sulzer Metco in developing a thermal spray process to produce coatings out of the vapor phase. Columnar thermal barrier coatings made of Yttria-stabilized Zircona (YSZ) are optimized to serve in a turbine engine. This process includes not only preferable coating properties such as strain tolerance and erosion resistance but also the simultaneous coverage of multiple air foils.

Membranes produced by plasma enhanced chemical vapor deposition technique for low temperature fuel cell applications

NASA Astrophysics Data System (ADS)

Ennajdaoui, Aboubakr; Roualdes, Stéphanie; Brault, Pascal; Durand, Jean

A plasma polymerization process using a continuous glow discharge has been implemented for preparing proton conducting membranes from trifluoromethane sulfonic acid and styrene. The chemical and physical structure of plasma membranes has been investigated using FTIR and SEM. The films are homogeneous with a good adhesion on commercial gas diffusion layer (E-Tek ®). Their deposition rate can be increased with increasing flow rate and input power. The thermogravimetric analysis under air of plasma polymers has showed a thermal stability up to 140 °C. Compared to the pulsed glow discharge studied in a previous paper, the continuous glow discharge has enabled to enhance the proton conductivity of membranes by a factor 3 (up to 1.7 mS cm -1). Moreover, the low methanol permeability (methanol diffusion coefficient down to 5 × 10 -13 m 2 s -1) of membranes has been confirmed by this study. In an industrial context, a reactor prototype has been developed to manufacture by plasma processes all active layers of fuel cell cores to be integrated in original compact PEMFC or DMFC.

A microwave plasma torch and its applications

NASA Astrophysics Data System (ADS)

Uhm, H. S.; Hong, Y. C.; Shin, D. H.

2006-05-01

A portable microwave plasma torch at atmospheric pressure by making use of magnetrons operated at 2.45 GHz and used in a home microwave oven has been developed. This electrodeless torch can be used in various areas including commercial, environmental and military applications. For example, perfluorocompounds (PFCs), which have long lifetimes and serious global warming implications, are widely used during plasma etching and plasma-assisted chamber cleaning processes in chemical vapour deposition systems. The microwave torch effectively eliminates PFCs. Efficient decomposition of toluene gas indicates the effectiveness of volatile organic compound eliminations from industrial emission and the elimination of airborne chemical and biological warfare agents. The microwave torch has been used to synthesize carbon nanotubes in an on-line system, thereby providing the opportunity of mass production of the nanotubes. There are other applications of the microwave plasma torch.

Latest Researches Advances of Plasma Spraying: From Splat to Coating Formation

NASA Astrophysics Data System (ADS)

Fauchais, P.; Vardelle, M.; Goutier, S.

2016-12-01

The plasma spray process with solid feedstock, mainly ceramics powders, studied since the sixties is now a mature technology. The plasma jet and particle in-flight characterizations are now well established. The use of computer-aided robot trajectory allows spraying on industrial parts with complex geometries. Works about splat formation have shown the importance of: the substrate preheating over the transition temperature to get rid of adsorbates and condensates, substrate chemistry, crystal structure and substrate temperature during the whole coating process. These studies showed that coating properties strongly depend on the splat formation and layering. The first part of this work deals with a summary of conventional plasma spraying key points. The second part presents the current knowledge in plasma spraying with liquid feedstock, technology developed for about two decades with suspensions of particles below micrometers or solutions of precursors that form particles a few micrometers sized through precipitation. Coatings are finely structured and even nanostructured with properties arousing the interest of researchers. However, the technology is by far more complex than the conventional ones. The main conclusions are that models should be developed further, plasma torches and injection setups adapted, and new measuring techniques to reliably characterize these small particles must be designed.

Toxicology and occupational hazards of new materials and processes in metal surface treatment, powder metallurgy, technical ceramics, and fiber-reinforced plastics.

PubMed

Midtgård, U; Jelnes, J E

1991-12-01

Many new materials and processes are about to find their way from the research laboratory into industry. The present paper describes some of these processes and provides an overview of possible occupational hazards and a list of chemicals used or produced in the processes. The technological areas that are considered are metal surface treatment (ion implantation, physical and chemical vapor deposition, plasma spraying), powder metallurgy, advanced technical ceramics, and fiber-reinforced plastics.

Conversion of CO2 to CO using radio-frequency atmospheric pressure plasmas

NASA Astrophysics Data System (ADS)

Foote, Alexander; Dedrick, James; O'Connell, Deborah; North, Michael; Gans, Timo

2016-09-01

Low temperature plasmas can be used for the in situ generation of CO, from relatively non-toxic CO2 . CO is very useful in many industrial chemical processes and so, via low temperature plasmas, CO2, a waste product, can be converted into a valuable chemical. The key challenges in using this method, for CO production, are optimising the energy efficiency, maximising the conversion of CO2 into CO and then separating the CO from the other species produced in the plasma. Very high yields of CO, greater than 90%, have been achieved at atmospheric pressure using argon as a carrier gas with admixtures up to 1.5% with energy efficiencies of up to 4%. The plasma generated in continuous and spatially homogeneous and is driven at a frequency of 40.68 MHz. A zero dimensional global model has also been used to simulate the chemical kinetics of the plasma to determine the dominant dissociation processes and is in good agreement with the experimentally determined yields. The model is used to determine how important a role the vibrational states of CO2 are, in a highly collisional plasma, to the production of CO and there can provide insight into how to improve the energy efficiency and suppress unwanted reactions.

Optical emission from a small scale model electric arc furnace in 250-600 nm region.

PubMed

Mäkinen, A; Niskanen, J; Tikkala, H; Aksela, H

2013-04-01

Optical emission spectroscopy has been for long proposed for monitoring and studying industrial steel making processes. Whereas the radiative decay of thermal excitations is always taking place in high temperatures needed in steel production, one of the most promising environment for such studies are electric arc furnaces, creating plasma in excited electronic states that relax with intense characteristic emission in the optical regime. Unfortunately, large industrial scale electric arc furnaces also present a challenging environment for optical emission studies and application of the method is not straightforward. To study the usability of optical emission spectroscopy in real electric arc furnaces, we have developed a laboratory scale DC electric arc furnace presented in this paper. With the setup, optical emission spectra of Fe, Cr, Cr2O3, Ni, SiO2, Al2O3, CaO, and MgO were recorded in the wavelength range 250-600 nm and the results were analyzed with the help of reference data. The work demonstrates that using characteristic optical emission, obtaining in situ chemical information from oscillating plasma of electric arc furnaces is indeed possible. In spite of complications, the method could possibly be applied to industrial scale steel making process in order to improve its efficiency.

Arc spray process for the aircraft and stationary gas turbine industry

NASA Astrophysics Data System (ADS)

Sampson, E. R.; Zwetsloot, M. P.

1997-06-01

Technological advances in arc spray have produced a system that competes favorably with other thermal spray processes. In the past, arc spray was thought of as a process for very large parts that need thick buildups. However, an attachment device known as the arc jet system has been developed that focuses the pattern and accelerates the particles. This attachment device, coupled with the in-troduction of metal-cored wires that provide the same chemistries as plasma-sprayed powders, pro-vides application engineers with a viable economic alternative to existing spray methods. A comparative evaluation of a standard production plasma spray system was conducted with the arc spray process using the attachment device. This evaluation was conducted by an airline company on four major parts coated with nickel-aluminum. Results show that, for these applications, the arc spray process offers several benefits.

PREFACE: 13th High-Tech Plasma Processes Conference (HTPP-2014)

NASA Astrophysics Data System (ADS)

2014-11-01

The High-Tech Plasma Processes - 13th European Plasma Conference (HTPP-2014) was held in Toulouse (France) on 22-27 June 2014. The conference series started in 1990 as a thermal plasma conference and has gradually expanded to include other related topics. Now the High-Tech Plasma Processes - European Plasma Conference (HTPP) is an international conference organised in Europe every two years with topics encompassing the whole field of plasma processing science. The aim of the conference is to bring different scientific communities together, to facilitate contacts between science, technology and industry and to provide a platform for the exploration of both the fundamental topics and new applications of plasmas. For this edition of HTPP, as was the case for the last, we have acheived a well balanced participation from the communities of both thermal and non-thermal plasma researchers. 142 people from 17 countries attended the conference with the total number of contributions being 155, consisting of 8 plenary and 8 invited talks plus 51 oral and 88 poster contributions. We have received numerous papers corresponding to the contributions of HTPP-2014 that have been submitted for publication in this volume of Journal of Physics: Conference Series. Each submitted contribution has been peer reviewed (60 referees with at least two reviewing each paper) and the Editors are very grateful to the referees for their careful support in improving the original manuscripts. In total, 52 manuscripts have been accepted for publication covering a range of topics of plasma processing science from plasma fundamentals to process applications through to experiments, diagnostics and modelling. We have grouped the papers into the following 5 topics: - Arc-Materials Interaction and Metallurgy - Plasma Torches and Spraying - Synthesis of Powders and Nanomaterials - Deposition and Surface Treatment - Non-Equilibrium Plasmas We deeply thank the authors for their enthusiastic and high-grade contributions and we are convinced that this volume of Journal of Physics: Conference Series will be interesting for our community. Finally, we would like to thank the conference chairmen, the members of the steering committee, the international scientific committee, the local organizing committee, the organizing secretariat and the financial support from the conference sponsors that allowed the success of HTPP-2014. The Editors of the HTPP-2014 Proceedings Dr Alain Gleizes, chairman of HTPP-2014 Prof. Jochen Schein, head of the ISC Prof. Philippe Teulet Toulouse, 14th October 2014

Flash (Ultra-Rapid) Spark-Plasma Sintering of Silicon Carbide

PubMed Central

Olevsky, Eugene A.; Rolfing, Stephen M.; Maximenko, Andrey L.

2016-01-01

A new ultra-rapid process of flash spark plasma sintering is developed. The idea of flash spark plasma sintering (or flash hot pressing - FHP) stems from the conducted theoretical analysis of the role of thermal runaway phenomena for material processing by flash sintering. The major purpose of the present study is to theoretically analyze the thermal runaway nature of flash sintering and to experimentally address the challenge of uncontrollable thermal conditions by the stabilization of the flash sintering process through the application of the external pressure. The effectiveness of the developed FHP technique is demonstrated by the few seconds–long consolidation of SiC powder in an industrial spark plasma sintering device. Specially designed sacrificial dies heat the pre-compacted SiC powder specimens to a critical temperature before applying any voltage to the powder volume and allowing the electrode-punches of the SPS device setup to contact the specimens and pass electric current through them under elevated temperatures. The experimental results demonstrate that flash sintering phenomena can be realized using conventional SPS devices. The usage of hybrid heating SPS devices is pointed out as the mainstream direction for the future studies and utilization of the new flash hot pressing (ultra-rapid spark plasma sintering) technique. PMID:27624641

Flash (Ultra-Rapid) Spark-Plasma Sintering of Silicon Carbide

DOE PAGES

Olevsky, Eugene A.; Rolfing, Stephen M.; Maximenko, Andrey L.

2016-09-14

A new ultra-rapid process of flash spark plasma sintering is developed. The idea of flash spark plasma sintering (or flash hot pressing - FHP) stems from the conducted theoretical analysis of the role of thermal runaway phenomena for material processing by flash sintering. The major purpose of the present study is to theoretically analyze the thermal runaway nature of flash sintering and to experimentally address the challenge of uncontrollable thermal conditions by the stabilization of the flash sintering process through the application of the external pressure. The effectiveness of the developed FHP technique is demonstrated by the few seconds–long consolidationmore » of SiC powder in an industrial spark plasma sintering device. Specially designed sacrificial dies heat the pre-compacted SiC powder specimens to a critical temperature before applying any voltage to the powder volume and allowing the electrode-punches of the SPS device setup to contact the specimens and pass electric current through them under elevated temperatures. The experimental results demonstrate that flash sintering phenomena can be realized using conventional SPS devices. The usage of hybrid heating SPS devices is pointed out as the mainstream direction for the future studies and utilization of the new flash hot pressing (ultra-rapid spark plasma sintering) technique.« less

Application of a Dielectric Barrier Discharge Atmospheric Cold Plasma (Dbd-Acp) for Eshcerichia Coli Inactivation in Apple Juice.

PubMed

Liao, Xinyu; Li, Jiao; Muhammad, Aliyu Idris; Suo, Yuanjie; Chen, Shiguo; Ye, Xingqian; Liu, Donghong; Ding, Tian

2018-02-01

Atmospheric cold plasma (ACP) is a promising non-thermal technology in food industry. In this study, a dielectric barrier discharge (DBD)-ACP exhibited strong bactericidal effect on Escherichia coli in apple juice. Under a 30 to 50 W input power, less than 40 s treatment time was required for DBD-ACP to result in 3.98 to 4.34 log CFU/mL reduction of E. coli in apple juice. The inactivation behavior of ACP on E. coli was well described by the Weibull model. During the treatment, the cell membrane of E. coli was damaged severely by active species produced by plasma, such as hydrogen peroxide, ozone and nitrate. In addition, the ACP exposure had slight effect on the °Brix, pH, titratable acidity (TA), color values, total phenolic content, and antioxidant capacity of apple juice. However, higher level of DBD-ACP treatment, 50 W for more than 10 s in this case, resulted in significant change of the pH, TA, color and total phenolic content of apple juice. The results in this study have provided insight in potential use of DBD-ACP as an alternative to thermal processing for fruit juices in food industry. Escherichia coli O157:H7 in apple juice is a potential risk for public health. This study demonstrated that 30 s cold plasma treatment resulted in more than 4 log CFU/mL reduction under 50 W, while the quality attributes of apple juice were not significantly affected. Therefore, cold plasma technology is a promising alternative substitute of traditional thermal processing for juice pasteurization. © 2018 Institute of Food Technologists®.

Elimination of diazinon insecticide from cucumber surface by atmospheric pressure air-dielectric barrier discharge plasma.

PubMed

Dorraki, Naghme; Mahdavi, Vahideh; Ghomi, Hamid; Ghasempour, Alireza

2016-12-06

The food industry is in a constant search for new technologies to improve the commercial sterilization process of agricultural commodities. Plasma treatment may offer a novel and efficient method for pesticide removal from agricultural product surfaces. To study the proposed technique of plasma food treatment, the degradation behavior of diazinon insecticide by air-dielectric barrier discharge (DBD) plasma was investigated. The authors studied the effect of different plasma powers and treatment times on pesticide concentration in liquid form and coated on the surface of cucumbers, where the diazinon residue was analyzed with mass spectroscopy gas chromatography. Our results suggest that atmospheric pressure air-DBD plasma is potentially effective for the degradation of diazinon insecticide, and mainly depends on related operating parameters, including plasma treatment time, discharge power, and pesticide concentrations. Based on the interaction between reactive oxygen species and electrons in the plasma with the diazinon molecule, two degradation pathway of diazinon during plasma treatment are proposed. It was also found that produced organophosphate pesticides are harmless and less hazardous compounds than diazinon.

Plasma Torch for Plasma Ignition and Combustion of Coal

NASA Astrophysics Data System (ADS)

Ustimenko, Alexandr; Messerle, Vladimir

2015-09-01

Plasma-fuel systems (PFS) have been developed to improve coal combustion efficiency. PFS is a pulverized coal burner equipped with arc plasma torch producing high temperature air stream of 4000 - 6000 K. Plasma activation of coal at the PFS increases the coal reactivity and provides more effective ignition and ecologically friendly incineration of low-rank coal. The main and crucial element of PFS is plasma torch. Simplicity and reliability of the industrial arc plasma torches using cylindrical copper cathode and air as plasma forming gas predestined their application at heat and power engineering for plasma aided coal combustion. Life time of these plasma torches electrodes is critical and usually limited to 200 hours. Considered in this report direct current arc plasma torch has the cathode life significantly exceeded 1000 hours. To ensure the electrodes long life the process of hydrocarbon gas dissociation in the electric arc discharge is used. In accordance to this method atoms and ions of carbon from near-electrode plasma deposit on the active surface of the electrodes and form electrode carbon condensate which operates as ``actual'' electrode. Complex physicochemical investigation showed that deposit consists of nanocarbon material.

Direct synthesis of graphene on silicon oxide by low temperature plasma enhanced chemical vapor deposition.

PubMed

Muñoz, Roberto; Martínez, Lidia; López-Elvira, Elena; Munuera, Carmen; Huttel, Yves; García-Hernández, Mar

2018-06-27

Direct graphene growth on silicon with a native oxide using plasma enhanced chemical vapour deposition at low temperatures [550 °C-650 °C] is demonstrated for the first time. It is shown that the fine-tuning of a two-step synthesis with gas mixtures C2H2/H2 yields monolayer and few layer graphene films with a controllable domain size from 50 nm to more than 300 nm and the sheet resistance ranging from 8 kΩ sq-1 to less than 1.8 kΩ sq-1. Differences are understood in terms of the interaction of the plasma species - chiefly atomic H - with the deposited graphene and the native oxide layer. The proposed low temperature direct synthesis on an insulating substrate does not require any transfer processes and improves the compatibility with the current industrial processes.

Sanitizing Rhetorics of the Commercial Blood Plasma Industry.

ERIC Educational Resources Information Center

Anderson, Leon; Moser, Christina

The United States blood plasma industry uses various rhetorics to access donors and markets its products while managing its stigma and potential legal liability. The industry includes both the public "nonprofit" sector and the private, for-profit blood collection and manufacturing businesses owned by pharmaceutical companies that rely on…

Ar + CO2 and He + CO2 Plasmas in ASTRAL

NASA Astrophysics Data System (ADS)

Boivin, R. F.; Gardner, A.; Munoz, J.; Kamar, O.; Loch, S.

2007-11-01

Spectroscopy study of the ASTRAL helicon plasma source running Ar + CO2 and He + CO2 gas mixes is presented. ASTRAL produces plasmas with the following parameters: ne = 10^10 - 10^13 cm-3, Te = 2 - 10 eV and Ti = 0.03 - 0.5 eV, B-field <= 1.3 kGauss, rf power <= 2 kWatt. A 0.33 m scanning monochromator is used for this study. Using Ar + CO2 gas mixes, very different plasmas are observed as the concentration of CO2 is changed. At low CO2 concentration, the bluish plasma is essentially atomic and argon transitions dominate the spectra. Weak C I and O I lines are present in the 750 - 1000 nm range. At higher CO2 concentration, the plasma becomes essentially molecular and is characterized by intense, white plasma columns. Here, spectra are filled with molecular bands (CO2, CO2^+, CO and CO^+). Limited molecular dissociative excitation processes associated with the production of C I and O I emission are also observed. On the other hand, He + CO2 plasmas are different. Here, rf matches are only possible at low CO2 concentration. Under these conditions, the spectra are characterized by strong C I and O I transitions with little or no molecular bands. Strong dissociative processes observed in these plasmas can be link to the high Te associated with He plasmas. An analysis of the spectra with possible scientific and industrial applications will be presented.

Electrical description of N2 capacitively coupled plasmas with the global model

NASA Astrophysics Data System (ADS)

Cao, Ming-Lu; Lu, Yi-Jia; Cheng, Jia; Ji, Lin-Hong; Engineering Design Team

2016-10-01

N2 discharges in a commercial capacitively coupled plasma reactor are modelled by a combination of an equivalent circuit and the global model, for a range of gas pressure at 1 4 Torr. The ohmic and inductive plasma bulk and the capacitive sheath are represented as LCR elements, with electrical characteristics determined by plasma parameters. The electron density and electron temperature are obtained from the global model in which a Maxwellian electron distribution is assumed. Voltages and currents are recorded by a VI probe installed after the match network. Using the measured voltage as an input, the current flowing through the discharge volume is calculated from the electrical model and shows excellent agreement with the measurements. The experimentally verified electrical model provides a simple and accurate description for the relationship between the external electrical parameters and the plasma properties, which can serve as a guideline for process window planning in industrial applications.

Atmospheric pressure plasma jet for bacterial decontamination and property improvement of fruit and vegetable processing wastewater

NASA Astrophysics Data System (ADS)

Mohamed, Abdel-Aleam H.; Shariff, Samir M. Al; Ouf, Salama A.; Benghanem, Mohamed

2016-05-01

An atmospheric pressure plasma jet was tested for decontaminating and improving the characteristics of wastewater derived from blackberry, date palm, tomato and beetroot processing industries. The jet was generated by blowing argon gas through a cylindrical alumina tube while a high voltage was applied between two electrodes surrounding the tube. Oxygen gas was mixed with argon at the rate of 0.2% and the argon mass flow was fixed at 4.5 slm. Images show that the generated plasma jet penetrated the treated wastewater samples. Plasma emission spectra show the presence of O and OH radicals as well as excited molecular nitrogen and argon. Complete decontamination of wastewater derived from date palm and tomato processing was achieved after 120 and 150 s exposure to the plasma jet, respectively. The bacterial count of wastewater from blackberry and beetroot was reduced by 0.41 and 2.24 log10 colony-forming units (CFU) per ml, respectively, after 180 s. Escherichia coli was the most susceptible bacterial species to the cold plasma while Shigella boydii had the minimum susceptibility, recording 1.30 and 3.34 log10 CFU ml-1, respectively, as compared to the 7.00 log10 initial count. The chemical oxygen demands of wastewater were improved by 57.5-93.3% after 180 s exposure to the plasma jet being tested. The endotoxins in the wastewater were reduced by up to 90.22%. The variation in plasma effectiveness is probably related to the antioxidant concentration of the different investigated wastewaters.

Scalable graphene production: perspectives and challenges of plasma applications

NASA Astrophysics Data System (ADS)

Levchenko, Igor; Ostrikov, Kostya (Ken); Zheng, Jie; Li, Xingguo; Keidar, Michael; B. K. Teo, Kenneth

2016-05-01

Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h-1 m-2 was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

Scalable graphene production: perspectives and challenges of plasma applications.

PubMed

Levchenko, Igor; Ostrikov, Kostya Ken; Zheng, Jie; Li, Xingguo; Keidar, Michael; B K Teo, Kenneth

2016-05-19

Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h(-1) m(-2) was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

Synthesis and design of silicide intermetallic materials

DOE Office of Scientific and Technical Information (OSTI.GOV)

Petrovic, J.J.; Castro, R.G.; Butt, D.P.

1997-04-01

The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the U.S. processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive U.S. processing industries. The program presently has amore » number of developing industrial connections, including a CRADA with Schuller International Inc. targeted at the area of MoSi{sub 2}-based high temperature materials and components for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. Current experimental emphasis is on the development and characterization of MoSi{sub 2}-Si{sub 3}N{sub 4} and MoSi{sub 2}-SiC composites, the plasma spraying of MoSi{sub 2}-based materials, and the joining of MoSi{sub 2} materials to metals.« less

Perfluorooctane sulfonate plasma half-life determination and long term tissue distribution in beef cattle (Bos taurus)

USDA-ARS?s Scientific Manuscript database

Perfluorooctane sulfonate (PFOS) is used in consumer products as a surfactant and is found in industrial and consumer waste which ends up in wastewater treatment plants (WWTPs). PFOS does not breakdown during WWTP processes and accumulates in the biosolids. Common practices include application of bi...

The spray-drying process is sufficient to inactivate infectious porcine epidemic diarrhea virus in plasma.

PubMed

Gerber, Priscilla F; Xiao, Chao-Ting; Chen, Qi; Zhang, Jianqiang; Halbur, Patrick G; Opriessnig, Tanja

2014-11-07

Porcine epidemic diarrhea virus (PEDV) is considered an emergent pathogen associated with high economic losses in many pig rearing areas. Recently it has been suggested that PEDV could be transmitted to naïve pig populations through inclusion of spray-dried porcine plasma (SDPP) into the nursery diet which led to a ban of SDPP in several areas in North America and Europe. To determine the effect of spray-drying on PEDV infectivity, 3-week-old pigs were intragastrically inoculated with (1) raw porcine plasma spiked with PEDV (RAW-PEDV-CONTROL), (2) porcine plasma spiked with PEDV and then spray dried (SD-PEDV-CONTROL), (3) raw plasma from PEDV infected pigs (RAW-SICK), (4) spray-dried plasma from PEDV infected pigs (SD-SICK), or (5) spray-dried plasma from PEDV negative pigs (SD-NEG-CONTROL). For the spray-drying process, a tabletop spray-dryer with industry-like settings for inlet and outlet temperatures was used. In the RAW-PEDV-CONTROL group, PEDV RNA was present in feces at day post infection (dpi) 3 and the pigs seroconverted by dpi 14. In contrast, PEDV RNA in feces was not detected in any of the pigs in the other groups including the SD-PEDV-CONTROL group and none of the pigs had seroconverted by termination of the project at dpi 28. This work provides direct evidence that the experimental spray-drying process used in this study was effective in inactivating infectious PEDV in the plasma. Additionally, plasma collected from PEDV infected pigs at peak disease did not contain infectious PEDV. These findings suggest that the risk for PEDV transmission through commercially produced SDPP is minimal. Copyright © 2014 Elsevier B.V. All rights reserved.

The surface modification of clay particles by RF plasma technique

NASA Astrophysics Data System (ADS)

Lee, Sang-Keol

In this study, the surface coatings of ball clay, organoclay and exfoliated clay prepared by sol-gel process were done by RF plasma polymerization to improve the surface activity of the clay filler. Characterization of the above plasma-treated clays has been carried out by various techniques. The effects of plasma-treated clays as substitute of carbon black in styrene-butadiene rubber (SBR) and ethylene-propylene-diene monomer (EPDM) on the curing and mechanical properties were investigated. After plasma treatment, the tensile properties of organo and exfoliated clay were not unsatisfactory to that of carbon black filler system. Moreover, only 10 phr filler loading of plasma-treated organoclay in EPDM vulcanizates showed better results than 40 phr filler loading of carbon black in EPDM vulcanizates. The main objective of this study was to verify the applicability of the plasma technique for modifying clay surfaces for their use in the tire manufacturing industry. Another purpose was to reveal the advantage of the plasma technique used to obtain modified-clay and improved properties that those materials can display.

A Real-Time Data Acquisition and Processing Framework Based on FlexRIO FPGA and ITER Fast Plant System Controller

NASA Astrophysics Data System (ADS)

Yang, C.; Zheng, W.; Zhang, M.; Yuan, T.; Zhuang, G.; Pan, Y.

2016-06-01

Measurement and control of the plasma in real-time are critical for advanced Tokamak operation. It requires high speed real-time data acquisition and processing. ITER has designed the Fast Plant System Controllers (FPSC) for these purposes. At J-TEXT Tokamak, a real-time data acquisition and processing framework has been designed and implemented using standard ITER FPSC technologies. The main hardware components of this framework are an Industrial Personal Computer (IPC) with a real-time system and FlexRIO devices based on FPGA. With FlexRIO devices, data can be processed by FPGA in real-time before they are passed to the CPU. The software elements are based on a real-time framework which runs under Red Hat Enterprise Linux MRG-R and uses Experimental Physics and Industrial Control System (EPICS) for monitoring and configuring. That makes the framework accord with ITER FPSC standard technology. With this framework, any kind of data acquisition and processing FlexRIO FPGA program can be configured with a FPSC. An application using the framework has been implemented for the polarimeter-interferometer diagnostic system on J-TEXT. The application is able to extract phase-shift information from the intermediate frequency signal produced by the polarimeter-interferometer diagnostic system and calculate plasma density profile in real-time. Different algorithms implementations on the FlexRIO FPGA are compared in the paper.

Possibilities in optical monitoring of laser welding process

NASA Astrophysics Data System (ADS)

Horník, Petr; Mrňa, Libor; Pavelka, Jan

2016-11-01

Laser welding is a modern, widely used but still not really common method of welding. With increasing demands on the quality of the welds, it is usual to apply automated machine welding and with on-line monitoring of the welding process. The resulting quality of the weld is largely affected by the behavior of keyhole. However, its direct observation during the welding process is practically impossible and it is necessary to use indirect methods. At ISI we have developed optical methods of monitoring the process. Most advanced is an analysis of radiation of laser-induced plasma plume forming in the keyhole where changes in the frequency of the plasma bursts are monitored and evaluated using Fourier and autocorrelation analysis. Another solution, robust and suitable for industry, is based on the observation of the keyhole inlet opening through a coaxial camera mounted in the welding head and the subsequent image processing by computer vision methods. A high-speed camera is used to understand the dynamics of the plasma plume. Through optical spectroscopy of the plume, we can study the excitation of elements in a material. It is also beneficial to monitor the gas flow of shielding gas using schlieren method.

Environmental Benign Process for Production of Molybdenum Metal from Sulphide Based Minerals

NASA Astrophysics Data System (ADS)

Rajput, Priyanka; Janakiram, Vangada; Jayasankar, Kalidoss; Angadi, Shivakumar; Bhoi, Bhagyadhar; Mukherjee, Partha Sarathi

2017-10-01

Molybdenum is a strategic and high temperature refractory metal which is not found in nature in free state, it is predominantly found in earth's crust in the form of MoO3/MoS2. The main disadvantage of the industrial treatment of Mo concentrate is that the process contains many stages and requires very high temperature. Almost in every step many gaseous, liquid, solid chemical substances are formed which require further treatment. To overcome the above drawback, a new alternative one step novel process is developed for the treatment of sulphide and trioxide molybdenum concentrates. This paper presents the results of the investigations on molybdenite dissociation (MoS2) using microwave assisted plasma unit as well as transferred arc thermal plasma torch. It is a single step process for the preparation of pure molybdenum metal from MoS2 by hydrogen reduction in thermal plasma. Process variable such as H2 gas, Ar gas, input current, voltage and time have been examined to prepare molybdenum metal. Molybdenum recovery of the order of 95% was achieved. The XRD results confirm the phases of molybdenum metal and the chemical analysis of the end product indicate the formation of metallic molybdenum (Mo 98%).

Industrial Applications of Low Temperature Plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bardsley, J N

2001-03-15

The use of low temperature plasmas in industry is illustrated by the discussion of four applications, to lighting, displays, semiconductor manufacturing and pollution control. The type of plasma required for each application is described and typical materials are identified. The need to understand radical formation, ionization and metastable excitation within the discharge and the importance of surface reactions are stressed.

Optimization of Dimensional accuracy in plasma arc cutting process employing parametric modelling approach

NASA Astrophysics Data System (ADS)

Naik, Deepak kumar; Maity, K. P.

2018-03-01

Plasma arc cutting (PAC) is a high temperature thermal cutting process employed for the cutting of extensively high strength material which are difficult to cut through any other manufacturing process. This process involves high energized plasma arc to cut any conducting material with better dimensional accuracy in lesser time. This research work presents the effect of process parameter on to the dimensional accuracy of PAC process. The input process parameters were selected as arc voltage, standoff distance and cutting speed. A rectangular plate of 304L stainless steel of 10 mm thickness was taken for the experiment as a workpiece. Stainless steel is very extensively used material in manufacturing industries. Linear dimension were measured following Taguchi’s L16 orthogonal array design approach. Three levels were selected to conduct the experiment for each of the process parameter. In all experiments, clockwise cut direction was followed. The result obtained thorough measurement is further analyzed. Analysis of variance (ANOVA) and Analysis of means (ANOM) were performed to evaluate the effect of each process parameter. ANOVA analysis reveals the effect of input process parameter upon leaner dimension in X axis. The results of the work shows that the optimal setting of process parameter values for the leaner dimension on the X axis. The result of the investigations clearly show that the specific range of input process parameter achieved the improved machinability.

Production of Green Steel from Red Mud: A Novel Concept

NASA Astrophysics Data System (ADS)

Bhoi, Bhagyadhar; Behera, Pravas Ranjan; Mishra, Chitta Ranjan

Red mud of Indian origin contains around 55% plus of Fe2O3 and is considered as a hazardous waste for the alumina industry. For production of one tone of alumina employing the Bayer's Process, around two tones of red mud is generated from three tones of Bauxite. Conventional process of steel making is not devoid of environmental pollution. In the present investigation, efforts have been made to produce steel from red mud by adopting reduction roasting, magnetic separation and hydrogen plasma smelting route. Magnetic fraction, containing enriched iron oxide and minimal content of alumina, is produced following the first two stages which is then subjected to hydrogen plasma smelting process for production of steel. This novel concept follows a green path way for production of steel free from pollution and is termed as green steel. Further, the only by-product that is produced in the process, is water, which is eco-friendly and recyclable.

Development of barrier coatings for cellulosic-based materials by cold plasma methods

NASA Astrophysics Data System (ADS)

Denes, Agnes Reka

Cellulose-based materials are ideal candidates for future industries that need to be based on environmentally safe technologies and renewable resources. Wood represents an important raw material and its application as construction material is well established. Cellophane is one of the most important cellulosic material and it is widely used as packaging material in the food industry. Outdoor exposure of wood causes a combination of physical and chemical degradation processes due to the combined effects of sunlight, moisture, fungi, and bacteria. Cold-plasma-induced surface modifications are an attractive way for tailoring the characteristics of lignocellulosic substrates to prevent weathering degradation. Plasma-polymerized hexamethyldisiloxane (PPHMDSO) was deposited onto wood surfaces to create water repellent characteristics. The presence of a crosslinked macromolecular structure was detected. The plasma coated samples exhibited very high water contact angle values indicating the existence of hydrophobic surfaces. Reflective and electromagnetic radiation-absorbent substances were incorporated with a high-molecular-weight polydimethylsiloxane polymer in liquid phase and deposited as thin layers on wood surfaces. The macromolecular films, containing the dispersed materials, were then converted into a three dimensional solid state network by exposure to a oxygen-plasma. It was demonstrated that both UV-absorbent and reflectant components incorporated into the plasma-generated PDMSO matrix protected the wood from weathering degradation. Reduced oxidation and less degradation was observed after simulated weathering. High water contact angle values indicated a strong hydrophobic character of the oxygen plasma-treated PDMSO-coated samples. Plasma-enhanced surface modifications and coatings were employed to create water-vapor barrier layers on cellophane substrate surfaces. HMDSO was selected as a plasma gas and oxygen was used to ablate amorphous regions. Oxygen plasma treated cellophane and oxygen plasma treated and PPHMDSO coated cellophane surfaces were comparatively analyzed and the corresponding surface wettability characteristics were evaluated. The plasma generated surface topographies controlled the morphology of the PPHMDSO layers. Higher temperature HMDSO plasma-state environments lead to insoluble, crosslinked layers. Continuous and pulsed Csb2Fsb6 plasmas were also used for surface modification and excellent surface fluorination was achieved under the pulsed plasma conditions.

Inactivation of Aspergillus flavus spores in a sealed package by cold plasma streamers

NASA Astrophysics Data System (ADS)

Sohbatzadeh, F.; Mirzanejhad, S.; Shokri, H.; Nikpour, M.

2016-06-01

The main objective of this study is to investigate the inactivation efficacy of cold streamers in a sealed package on pathogenic fungi Aspergillus flavus ( A. flavus) spores that artificially contaminated pistachio surface. To produce penetrating cold streamers, electric power supply was adapted to deposit adequate power into the package. The plasma streamers were generated by an alternating high voltage with carrier frequency of 12.5 kHz which was suppressed by a modulated pulsed signal at frequency of 110 Hz. The plasma exposition time was varied from 8 to 18 min to show the effect of the plasma treatment on fungal clearance while the electrode and sample remained at room temperature. This proved a positive effect of the cold streamers treatment on fungal clearance. Benefits of deactivation of fungal spores by streamers inside the package include no heating, short treatment time and adaptability to existing processes. Given its ability to ensure the safety and longevity of food products, this technology has great potential for utilization in food packaging and processing industry. In this study, moisture and pH changes of pistachio samples after plasma streamers treatment were also investigated.

Lab- and space-based researchers discuss plasma experiments

NASA Astrophysics Data System (ADS)

Baker, D. N.; Yamada, M.

Plasma physics provides a common language and set of approaches that tie together all scientists who study the acceleration, transport, and loss processes of the plasma state. Some years ago, researchers from the laboratory and space research communities suggested a workshop to bring together the diverse researchers in the respective fields. A series of workshops on the “Interrelationship between Plasma Experiments in the Laboratory and Space” (IPELS) was established, and the third meeting was held July 24-28, 1995, in the beautiful and historic town of Pitlochry in the Scottish Highlands.The conference reestablished the critical point that plasma physics is an important but surprisingly diversified research discipline. Meetings attendees discussed a number of new approaches to plasma research, including novel diagnostic techniques for use in space, such as active antennas and electric field sounding devices. Detailed discussions covered spacecraft-plasma environment interactions, including vehicle charging and neutral gas release; fundamental aspects of industrial application of dusty plasmas and waves in dusty plasmas; a very distinctive phase transition of coulomb crystals (from solid state to liquid state) in dusty plasmas; and terrella experiments to simulate and study chaotic transport in the ionosphere.

Workplace exposure and release of ultrafine particles during atmospheric plasma spraying in the ceramic industry.

PubMed

Viana, M; Fonseca, A S; Querol, X; López-Lilao, A; Carpio, P; Salmatonidis, A; Monfort, E

2017-12-01

Atmospheric plasma spraying (APS) is a frequently used technique to produce enhanced-property coatings for different materials in the ceramic industry. This work aimed to characterise and quantify the impact of APS on workplace exposure to airborne particles, with a focus on ultrafine particles (UFPs, <100nm) and nanoparticles (<50nm). Particle number, mass concentrations, alveolar lung deposited surface area concentration, and size distributions, in the range 10nm-20μm were simultaneously monitored at the emission source, in the potential worker breathing zone, and in outdoor air. Different input materials (known as feedstock) were tested: (a) micron-sized powders, and (b) suspensions containing submicron- or nano-sized particles. Results evidenced significantly high UFP concentrations (up to 3.3×10 6 /cm 3 ) inside the spraying chamber, which impacted exposure concentrations in the worker area outside the spraying chamber (up to 8.3×10 5 /cm 3 ). Environmental release of UFPs was also detected (3.9×10 5 /cm 3 , outside the exhaust tube). Engineered nanoparticle (ENP) release to workplace air was also evidenced by TEM microscopy. UFP emissions were detected during the application of both micron-sized powder and suspensions containing submicron- or nano-sized particles, thus suggesting that emissions were process- (and not material-) dependent. An effective risk prevention protocol was implemented, which resulted in a reduction of UFP exposure in the worker area. These findings demonstrate the potential risk of occupational exposure to UFPs during atmospheric plasma spraying, and raise the need for further research on UFP formation mechanisms in high-energy industrial processes. Copyright © 2017 The Authors. Published by Elsevier B.V. All rights reserved.

FAST TRACK COMMUNICATION: Asymmetric surface barrier discharge plasma driven by pulsed 13.56 MHz power in atmospheric pressure air

NASA Astrophysics Data System (ADS)

Dedrick, J.; Boswell, R. W.; Charles, C.

2010-09-01

Barrier discharges are a proven method of generating plasmas at high pressures, having applications in industrial processing, materials science and aerodynamics. In this paper, we present new measurements of an asymmetric surface barrier discharge plasma driven by pulsed radio frequency (rf 13.56 MHz) power in atmospheric pressure air. The voltage, current and optical emission of the discharge are measured temporally using 2.4 kVp-p (peak to peak) 13.56 MHz rf pulses, 20 µs in duration. The results exhibit different characteristics to plasma actuators, which have similar discharge geometry but are typically driven at frequencies of up to about 10 kHz. However, the electrical measurements are similar to some other atmospheric pressure, rf capacitively coupled discharge systems with symmetric electrode configurations and different feed gases.

University Researchers Approach to Providing Computer Simulations to Industry.

NASA Astrophysics Data System (ADS)

Birdsall, Charles

1996-05-01

University researchers perform in an exploratory mode in developing and applying computer simulations to their research problems. Post-docs and students make codes suited to their problems, and to thesis and article writing, with little code use planned beyond such. Industry product developers want well tested, cleanly applicable simulation codes, with freedom to go to the code developers for bug fixing and improvements (and not to have to hunt for a student who has graduated). Hence, these different modes clash; some cushion of understanding and new elements are needed to effect broader, continuing use of university developed codes. We and others have evolved approaches that appear to work, including providing free software, but with follow-ups done by small companies. (See Ref. 1 for more.) We will present our development of plasma device codes over 15 years, evolving into free distribution on the Internet (Ref. 2) with short courses and workshops; follow-ups are done by a small company (of former students, the code writers). In addition, an example of university code development will be given, that of application of the series (or dipole) resonance to providing plasma surface wave generated plasmas, drawing on decades old research; potential applications will be given. We will present what other university groups are doing and reflections on these modes by modelers and designers in the plasma processing industry (semiconductor manufacturing equipment companies), which is highly empirical at present. All of this interaction is still evolving. 9 Brown J. Browning, Sci.Am. Jan 1996, p.35 www See Internet address http://ptsg.eecs.berkeley.edu thebibliography

Nano-Disperse Borides and Carbides: Plasma Technology Production, Specific Properties, Economic Evaluation

NASA Astrophysics Data System (ADS)

Galevskii, G. V.; Rudneva, V. V.; Galevskii, S. G.; Tomas, K. I.; Zubkov, M. S.

2016-04-01

The experience of production and study on properties of nano-disperse chromium and titanium borides and carbides, and silicon carbide has been generalized. The structure and special service aspects of utilized plasma-metallurgical complex equipped with a three-jet direct-flow reactor with a capacity of 150 kW have been outlined. Processing, heat engineering and service life characteristics of the reactor are specified. The synthesis parameters of borides and carbides, as well as their basic characteristics in nano-disperse condition and their production flow diagram are outlined. Engineering and economic performance of synthesizing borides in laboratory and industrial conditions is assessed, and the respective segment of the international market as well. The work is performed at State Siberian Industrial University as a project part of the State Order of Ministry of Science and Education of the Russian Federation No. 11.1531/2014/K.

Dusty (complex) plasmas: recent developments, advances, and unsolved problems

NASA Astrophysics Data System (ADS)

Popel, Sergey

The area of dusty (complex) plasma research is a vibrant subfield of plasma physics that be-longs to frontier research in physical sciences. This area is intrinsically interdisciplinary and encompasses astrophysics, planetary science, atmospheric science, magnetic fusion energy sci-ence, and various applied technologies. The research in dusty plasma started after two major discoveries in very different areas: (1) the discovery by the Voyager 2 spacecraft in 1980 of the radial spokes in Saturn's B ring, and (2) the discovery of the early 80's growth of contaminating dust particles in plasma processing. Dusty plasmas are ubiquitous in the universe; examples are proto-planetary and solar nebulae, molecular clouds, supernovae explosions, interplanetary medium, circumsolar rings, and asteroids. Within the solar system, we have planetary rings (e.g., Saturn and Jupiter), Martian atmosphere, cometary tails and comae, dust clouds on the Moon, etc. Close to the Earth, there are noctilucent clouds and polar mesospheric summer echoes, which are clouds of tiny (charged) ice particles that are formed in the summer polar mesosphere at the altitudes of about 82-95 km. Dust and dusty plasmas are also found in the vicinity of artificial satellites and space stations. Dust also turns out to be common in labo-ratory plasmas, such as in the processing of semiconductors and in tokamaks. In processing plasmas, dust particles are actually grown in the discharge from the reactive gases used to form the plasmas. An example of the relevance of industrial dusty plasmas is the growth of silicon microcrystals for improved solar cells in the future. In fact, nanostructured polymorphous sili-con films provide solar cells with high and time stable efficiency. These nano-materials can also be used for the fabrication of ultra-large-scale integration circuits, display devices, single elec-tron devices, light emitting diodes, laser diodes, and others. In microelectronic industries, dust has to be kept under control in the manufacture of microchips, otherwise charged dust particles (also known as killer particles) can destroy electronic circuits. In magnetic fusion research using tokamaks, one realizes that the absorption of tritium by dust fragments could cause a serious health hazard. The evaporation of dust particles could also lead to bremsstrahlung adversely affecting the energy gain of the tokamaks or other fusion devices. The specific features of dusty plasmas are a possibility of the formation of dust Coulomb lattices and the anomalous dissi-pation arising due to the interplay between plasmas and charged dust grains. These features determine new physics of dusty plasmas including, in particular, phase transitions and critical point phenomena, wave propagation, nonlinear effects and turbulence, dissipative and coherent structures, etc. The present review covers the main aspects of the area of dusty (complex) plasma research. The author acknowledges the financial support of the Division of Earth Sci-ences, Russian Academy of Sciences (the basic research program "Nanoscale particles in nature and technogenic products: conditions of existence, physical and chemical properties, and mech-anisms of formation"'), of the Division of Physical Sciences, Russian Academy of Sciences (the basic research program "Plasma physics in the Solar system"), of the Dynasty Foundation, as well as of the Russian Foundation for Basic Research.

Plasma coating of nanoparticles in the presence of an external electric field

NASA Astrophysics Data System (ADS)

Ebadi, Zahra; Pourali, Nima; Mohammadzadeh, Hosein

2018-04-01

Film deposition onto nanoparticles by low-pressure plasma in the presence of an external electric field is studied numerically. The plasma discharge fluid model along with surface deposition and heating models for nanoparticles, as well as a dynamics model considering the motion of nanoparticles, are employed for this study. The results of the simulation show that applying external field during the process increases the uniformity of the film deposited onto nanoparticles and leads to that nanoparticles grow in a spherical shape. Increase in film uniformity and particles sphericity is related to particle dynamics that is controlled by parameters of the external field like frequency and amplitude. The results of this work can be helpful to produce spherical core-shell nanoparticles in nanomaterial industry.

Chlorine-rich plasma polymer coating for the prevention of attachment of pathogenic fungal cells onto materials surfaces

NASA Astrophysics Data System (ADS)

Lamont-Friedrich, Stephanie J.; Michl, Thomas D.; Giles, Carla; Griesser, Hans J.; Coad, Bryan R.

2016-07-01

The attachment of pathogenic fungal cells onto materials surfaces, which is often followed by biofilm formation, causes adverse consequences in a wide range of areas. Here we have investigated the ability of thin film coatings from chlorinated molecules to deter fungal colonization of solid materials by contact killing of fungal cells reaching the surface of the coating. Coatings were deposited onto various substrate materials via plasma polymerization, which is a substrate-independent process widely used for industrial coating applications, using 1,1,2-trichloroethane as the process vapour. XPS surface analysis showed that the coatings were characterized by a highly chlorinated hydrocarbon polymer nature, with only a very small amount of oxygen incorporated. The activity of these coatings against human fungal pathogens was quantified using a recently developed, modified yeast assay and excellent antifungal activity was observed against Candida albicans and Candida glabrata. Plasma polymer surface coatings derived from chlorinated hydrocarbon molecules may therefore offer a promising solution to preventing yeast and mould biofilm formation on materials surfaces, for applications such as air conditioners, biomedical devices, food processing equipment, and others.

Nanocarbon materials fabricated using plasmas

NASA Astrophysics Data System (ADS)

Hatakeyama, Rikizo

2017-12-01

Since the discovery of fullerenes more than three decades ago, new kinds of nanoscale materials of carbon allotropes called "nanocarbons" have so far been discovered or synthesized at successive intervals as cases such as carbon nanotubes, carbon nanohorns, graphene, carbon nanowalls, and a carbon nanobelt, while nanodiamonds were actually discovered before then. Their attractively excellent mechanical, physical, and chemical properties have driven researchers to continuously create one of the hottest frontiers in materials science and technology. While plasma states have often been involved in their discovery, on the other hand, plasma-based approaches to this exciting field originally hold promising and enormous potentials for advancing and expanding industrial/biomedical applications of nanocarbons of great diversity. This article provides an extensive overview on plasma-fabricated nanocarbon materials, where the term "fabrication" is defined as synthesis, functionalization, and assembly of devices to cover a wide range of issues associated with the step-by-step plasma processes. Specific attention has been paid to the comparative examination between plasma-based and non-plasma methods for fabricating the nanocarobons with an emphasis on the advantages of plasma processing, such as low-temperature/large-scale fabrication and diversity-carrying structure controllability. The review ends with current challenges and prospects including a ripple effect of the nanocarbon studies on the development of related novel nanomaterials such as transition metal dichalcogenides. It contains not only the latest progress in the field for cutting-edge scientists and engineers, but also the introductory guidance to non-specialists such as lower-class graduate students.

Spectroscopic analysis technique for arc-welding process control

NASA Astrophysics Data System (ADS)

Mirapeix, Jesús; Cobo, Adolfo; Conde, Olga; Quintela, María Ángeles; López-Higuera, José-Miguel

2005-09-01

The spectroscopic analysis of the light emitted by thermal plasmas has found many applications, from chemical analysis to monitoring and control of industrial processes. Particularly, it has been demonstrated that the analysis of the thermal plasma generated during arc or laser welding can supply information about the process and, thus, about the quality of the weld. In some critical applications (e.g. the aerospace sector), an early, real-time detection of defects in the weld seam (oxidation, porosity, lack of penetration, ...) is highly desirable as it can reduce expensive non-destructive testing (NDT). Among others techniques, full spectroscopic analysis of the plasma emission is known to offer rich information about the process itself, but it is also very demanding in terms of real-time implementations. In this paper, we proposed a technique for the analysis of the plasma emission spectrum that is able to detect, in real-time, changes in the process parameters that could lead to the formation of defects in the weld seam. It is based on the estimation of the electronic temperature of the plasma through the analysis of the emission peaks from multiple atomic species. Unlike traditional techniques, which usually involve peak fitting to Voigt functions using the Levenberg-Marquardt recursive method, we employ the LPO (Linear Phase Operator) sub-pixel algorithm to accurately estimate the central wavelength of the peaks (allowing an automatic identification of each atomic species) and cubic-spline interpolation of the noisy data to obtain the intensity and width of the peaks. Experimental tests on TIG-welding using fiber-optic capture of light and a low-cost CCD-based spectrometer, show that some typical defects can be easily detected and identified with this technique, whose typical processing time for multiple peak analysis is less than 20msec. running in a conventional PC.

III International Conference on Laser and Plasma Researches and Technologies

NASA Astrophysics Data System (ADS)

2017-12-01

A.P. Kuznetsov and S.V. Genisaretskaya III Conference on Plasma and Laser Research and Technologies took place on January 24th until January 27th, 2017 at the National Research Nuclear University "MEPhI" (NRNU MEPhI). The Conference was organized by the Institute for Laser and Plasma Technologies and was supported by the Competitiveness Program of NRNU MEPhI. The conference program consisted of nine sections: • Laser physics and its application • Plasma physics and its application • Laser, plasma and radiation technologies in industry • Physics of extreme light fields • Controlled thermonuclear fusion • Modern problems of theoretical physics • Challenges in physics of solid state, functional materials and nanosystems • Particle accelerators and radiation technologies • Modern trends of quantum metrology. The conference is based on scientific fields as follows: • Laser, plasma and radiation technologies in industry, energetic, medicine; • Photonics, quantum metrology, optical information processing; • New functional materials, metamaterials, “smart” alloys and quantum systems; • Ultrahigh optical fields, high-power lasers, Mega Science facilities; • High-temperature plasma physics, environmentally-friendly energetic based on controlled thermonuclear fusion; • Spectroscopic synchrotron, neutron, laser research methods, quantum mechanical calculation and computer modelling of condensed media and nanostructures. More than 250 specialists took part in the Conference. They represented leading Russian scientific research centers and universities (National Research Centre "Kurchatov Institute", A.M. Prokhorov General Physics Institute, P.N. Lebedev Physical Institute, Troitsk Institute for Innovation and Fusion Research, Joint Institute for Nuclear Research, Moscow Institute of Physics and Tecnology and others) and leading scientific centers and universities from Germany, France, USA, Canada, Japan. We would like to thank heartily all of the speakers, participants, organizing and program committee members for their contribution to the conference.

Characterization and Surface Treatment of Materials Used in MADEAL S.A. Industry Productive Process of Rims by Plasma Assisted Repetitive Pulsed Arcs Technique

NASA Astrophysics Data System (ADS)

Jiménez, H.; Salazar, V. H.; Devia, A.; Jaramillo, S.; Velez, G.

2006-12-01

A study of materials used in the molds production to aluminium rims manufacture in the MADEAL S.A. factory was carried out for apply a plasma assisted surface treatment consists in growing TiAlN hard coatings that it protects this molds in the productive process. This coating resists high oxidation temperatures, of the other of 800 °C, high hardness (2800 Vickers) and low friction coefficient. A plasma assisted repetitive pulsed arcs mono-evaporator system was used in the grow of the TiAlN coatings, the TiAlN target is a sinterized 50% Ti and 50% Al, in the substrate they were used two types of steel that compose the molds injection pieces for the rims production. These materials were subjected to linear and fluctuating thermal changes in the Bruker axs X-Ray diffractometer temperature chamber, what simulated the molds thermal variation in the rims production process and they were compared with TiAlN coatings subjected to same thermal changes. The Materials characterization, before and later of thermal process, was carried out using XRD, SPM and EDS techniques, to analyze the crystallographic, topographic and chemical surface structure behaviours.

Complex (dusty) plasmas-kinetic studies of strong coupling phenomena

DOE Office of Scientific and Technical Information (OSTI.GOV)

Morfill, Gregor E.; Ivlev, Alexei V.; Thomas, Hubertus M.

2012-05-15

'Dusty plasmas' can be found almost everywhere-in the interstellar medium, in star and planet formation, in the solar system in the Earth's atmosphere, and in the laboratory. In astrophysical plasmas, the dust component accounts for only about 1% of the mass, nevertheless this component has a profound influence on the thermodynamics, the chemistry, and the dynamics. Important physical processes are charging, sputtering, cooling, light absorption, and radiation pressure, connecting electromagnetic forces to gravity. Surface chemistry is another important aspect. In the laboratory, there is great interest in industrial processes (e.g., etching, vapor deposition) and-at the fundamental level-in the physics ofmore » strong coupling phenomena. Here, the dust (or microparticles) are the dominant component of the multi-species plasma. The particles can be observed in real time and space, individually resolved at all relevant length and time scales. This provides an unprecedented means for studying self-organisation processes in many-particle systems, including the onset of cooperative phenomena. Due to the comparatively large mass of the microparticles (10{sup -12}to10{sup -9}g), precision experiments are performed on the ISS. The following topics will be discussed: Phase transitions, phase separation, electrorheology, flow phenomena including the onset of turbulence at the kinetic level.« less

Landmarks in the historical development of twenty first century food processing technologies.

PubMed

Misra, N N; Koubaa, Mohamed; Roohinejad, Shahin; Juliano, Pablo; Alpas, Hami; Inácio, Rita S; Saraiva, Jorge A; Barba, Francisco J

2017-07-01

Over a course of centuries, various food processing technologies have been explored and implemented to provide safe, fresher-tasting and nutritive food products. Among these technologies, application of emerging food processes (e.g., cold plasma, pressurized fluids, pulsed electric fields, ohmic heating, radiofrequency electric fields, ultrasonics and megasonics, high hydrostatic pressure, high pressure homogenization, hyperbaric storage, and negative pressure cavitation extraction) have attracted much attention in the past decades. This is because, compared to their conventional counterparts, novel food processes allow a significant reduction in the overall processing times with savings in energy consumption, while ensuring food safety, and ample benefits for the industry. Noteworthily, industry and university teams have made extensive efforts for the development of novel technologies, with sound scientific knowledge of their effects on different food materials. The main objective of this review is to provide a historical account of the extensive efforts and inventions in the field of emerging food processing technologies since their inception to present day. Copyright © 2017 Elsevier Ltd. All rights reserved.

Real time closed loop control of an Ar and Ar/O2 plasma in an ICP

NASA Astrophysics Data System (ADS)

Faulkner, R.; Soberón, F.; McCarter, A.; Gahan, D.; Karkari, S.; Milosavljevic, V.; Hayden, C.; Islyaikin, A.; Law, V. J.; Hopkins, M. B.; Keville, B.; Iordanov, P.; Doherty, S.; Ringwood, J. V.

2006-10-01

Real time closed loop control for plasma assisted semiconductor manufacturing has been the subject of academic research for over a decade. However, due to process complexity and the lack of suitable real time metrology, progress has been elusive and genuine real time, multi-input, multi-output (MIMO) control of a plasma assisted process has yet to be successfully implemented in an industrial setting. A Splasma parameter control strategy T is required to be adopted whereby process recipes which are defined in terms of plasma properties such as critical species densities as opposed to input variables such as rf power and gas flow rates may be transferable between different chamber types. While PIC simulations and multidimensional fluid models have contributed considerably to the basic understanding of plasmas and the design of process equipment, such models require a large amount of processing time and are hence unsuitable for testing control algorithms. In contrast, linear dynamical empirical models, obtained through system identification techniques are ideal in some respects for control design since their computational requirements are comparatively small and their structure facilitates the application of classical control design techniques. However, such models provide little process insight and are specific to an operating point of a particular machine. An ideal first principles-based, control-oriented model would exhibit the simplicity and computational requirements of an empirical model and, in addition, despite sacrificing first principles detail, capture enough of the essential physics and chemistry of the process in order to provide reasonably accurate qualitative predictions. This paper will discuss the development of such a first-principles based, control-oriented model of a laboratory inductively coupled plasma chamber. The model consists of a global model of the chemical kinetics coupled to an analytical model of power deposition. Dynamics of actuators including mass flow controllers and exhaust throttle are included and sensor characteristics are also modelled. The application of this control-oriented model to achieve multivariable closed loop control of specific species e.g. atomic Oxygen and ion density using the actuators rf power, Oxygen and Argon flow rates, and pressure/exhaust flow rate in an Ar/O2 ICP plasma will be presented.

Experimental investigation of gas flow rate and electric field effect on refractive index and electron density distribution of cold atmospheric pressure-plasma by optical method, Moiré deflectometry

NASA Astrophysics Data System (ADS)

Khanzadeh, Mohammad; Jamal, Fatemeh; Shariat, Mahdi

2018-04-01

Nowadays, cold atmospheric-pressure (CAP) helium plasma jets are widely used in material processing devices in various industries. Researchers often use indirect and spectrometric methods for measuring the plasma parameters which are very expensive. In this paper, for the first time, characterization of CAP, i.e., finding its parameters such as refractive index and electron density distribution, was carried out using an optical method, Moiré deflectometry. This method is a wave front analysis technique based on geometric optics. The advantages of this method are simplicity, high accuracy, and low cost along with the non-contact, non-destructive, and direct measurement of CAP parameters. This method demonstrates that as the helium gas flow rate decreases, the refractive index increases. Also, we must note that the refractive index is larger in the gas flow consisting of different flow rates of plasma comparing with the gas flow without the plasma.

RF Models for Plasma-Surface Interactions in VSim

NASA Astrophysics Data System (ADS)

Jenkins, Thomas G.; Smithe, D. N.; Pankin, A. Y.; Roark, C. M.; Zhou, C. D.; Stoltz, P. H.; Kruger, S. E.

2014-10-01

An overview of ongoing enhancements to the Plasma Discharge (PD) module of Tech-X's VSim software tool is presented. A sub-grid kinetic sheath model, developed for the accurate computation of sheath potentials near metal and dielectric-coated walls, enables the physical effects of DC and RF sheath physics to be included in macroscopic-scale plasma simulations that need not explicitly resolve sheath scale lengths. Sheath potential evolution, together with particle behavior near the sheath, can thus be simulated in complex geometries. Generalizations of the model to include sputtering, secondary electron emission, and effects from multiple ion species and background magnetic fields are summarized; related numerical results are also presented. In addition, improved tools for plasma chemistry and IEDF/EEDF visualization and modeling are discussed, as well as our initial efforts toward the development of hybrid fluid/kinetic transition capabilities within VSim. Ultimately, we aim to establish VSimPD as a robust, efficient computational tool for modeling industrial plasma processes. Supported by US DoE SBIR-I/II Award DE-SC0009501.

Aerospace Applications of Non-Equilibrium Plasma

NASA Technical Reports Server (NTRS)

Blankson, Isaiah M.

2016-01-01

Nonequilibrium plasma/non-thermal plasma/cold plasmas are being used in a wide range of new applications in aeronautics, active flow control, heat transfer reduction, plasma-assisted ignition and combustion, noise suppression, and power generation. Industrial applications may be found in pollution control, materials surface treatment, and water purification. In order for these plasma processes to become practical, efficient means of ionization are necessary. A primary challenge for these applications is to create a desired non-equilibrium plasma in air by preventing the discharge from transitioning into an arc. Of particular interest is the impact on simulations and experimental data with and without detailed consideration of non-equilibrium effects, and the consequences of neglecting non-equilibrium. This presentation will provide an assessment of the presence and influence of non-equilibrium phenomena for various aerospace needs and applications. Specific examples to be considered will include the forward energy deposition of laser-induced non-equilibrium plasmoids for sonic boom mitigation, weakly ionized flows obtained from pulsed nanosecond discharges for an annular Hall type MHD generator duct for turbojet energy bypass, and fundamental mechanisms affecting the design and operation of novel plasma-assisted reactive systems in dielectric liquids (water purification, in-pipe modification of fuels, etc.).

Modeling of capacitively and inductively coupled plasma for molecular decontamination

NASA Astrophysics Data System (ADS)

Mihailova, Diana; Hagelaar, Gerjan; Belenguer, Philippe; Laurent, Christopher; Lo, Juslan; Caillier, Bruno; Therese, Laurent; Guillot, Philippe

2013-09-01

This project aims to study and to develop new technology bricks for next generation of molecular decontamination systems, including plasma solution, for various applications. The contamination control in the processing stages is a major issue for the industrial performance as well as for the development of new technologies in the surface treatment area. The main task is to create uniform low temperature plasma inside a reactor containing the object to be treated. Different plasma sources are modeled with the aim of finding the most efficient one for surface decontamination: inductively coupled plasma, capacitively coupled plasma and combination of both. The model used for testing the various plasma sources is a time dependent two-dimensional multi-fluid model. The model is applied to a simplified cylindrically symmetric geometry in pure argon gas. The modeling results are validated by comparison with experimental results and observations based on optical and physical diagnostic tools. The influence of various parameters (power, pressure, flow) is studied and the corresponding results are presented, compared and discussed. This work has been performed in the frame of the collaborative program PAUD (Plasma Airborne molecular contamination Ultra Desorption) funded by the French agency OSEO and certified by French global competitive clusters Minalogic and Trimatec.

Optimizing laser produced plasmas for efficient extreme ultraviolet and soft X-ray light sources

NASA Astrophysics Data System (ADS)

Sizyuk, Tatyana; Hassanein, Ahmed

2014-08-01

Photon sources produced by laser beams with moderate laser intensities, up to 1014 W/cm2, are being developed for many industrial applications. The performance requirements for high volume manufacture devices necessitate extensive experimental research supported by theoretical plasma analysis and modeling predictions. We simulated laser produced plasma sources currently being developed for several applications such as extreme ultraviolet lithography using 13.5% ± 1% nm bandwidth, possibly beyond extreme ultraviolet lithography using 6.× nm wavelengths, and water-window microscopy utilizing 2.48 nm (La-α) and 2.88 nm (He-α) emission. We comprehensively modeled plasma evolution from solid/liquid tin, gadolinium, and nitrogen targets as three promising materials for the above described sources, respectively. Results of our analysis for plasma characteristics during the entire course of plasma evolution showed the dependence of source conversion efficiency (CE), i.e., laser energy to photons at the desired wavelength, on plasma electron density gradient. Our results showed that utilizing laser intensities which produce hotter plasma than the optimum emission temperatures allows increasing CE for all considered sources that, however, restricted by the reabsorption processes around the main emission region and this restriction is especially actual for the 6.× nm sources.

Optical sensor for real-time weld defect detection

NASA Astrophysics Data System (ADS)

Ancona, Antonio; Maggipinto, Tommaso; Spagnolo, Vincenzo; Ferrara, Michele; Lugara, Pietro M.

2002-04-01

In this work we present an innovative optical sensor for on- line and non-intrusive welding process monitoring. It is based on the spectroscopic analysis of the optical VIS emission of the welding plasma plume generated in the laser- metal interaction zone. Plasma electron temperature has been measured for different chemical species composing the plume. Temperature signal evolution has been recorded and analyzed during several CO2-laser welding processes, under variable operating conditions. We have developed a suitable software able to real time detect a wide range of weld defects like crater formation, lack of fusion, excessive penetration, seam oxidation. The same spectroscopic approach has been applied for electric arc welding process monitoring. We assembled our optical sensor in a torch for manual Gas Tungsten Arc Welding procedures and tested the prototype in a manufacturing industry production line. Even in this case we found a clear correlation between the signal behavior and the welded joint quality.

Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

NASA Astrophysics Data System (ADS)

Bézard, P.; Chevalier, X.; Legrain, A.; Navarro, C.; Nicolet, C.; Fleury, G.; Cayrefourcq, I.; Tiron, R.; Zelsmann, M.

2018-03-01

In this work, we present our recent achievements on the integration and transfer etching of a novel silicon-containing high-χ block copolymer for lines/spaces applications. Developed carbo-silane BCPs are synthesized under industrial conditions and present periodicities as low as 14 nm. A full directed self-assembly by graphoepitaxy process is shown using standard photolithography stacks and all processes are performed on 300 mm wafer compatible tools. Specific plasma processes are developed to isolate perpendicular lamellae and sub-12 nm features are finally transferred into silicon substrates. The quality of the final BCP hard mask (CDU, LWR, LER) are also investigated. Finally, thanks to the development of dedicated neutral layers and top-coats allowing perpendicular orientations, it was possible to investigate plasma etching experiments on full-sheets at 7 nm resolution, opening the way to the integration of these polymers in chemoepitaxy stacks.

Assessment of the disinfection capacity and eco-toxicological impact of atmospheric cold plasma for treatment of food industry effluents.

PubMed

Patange, Apurva; Boehm, Daniela; Giltrap, Michelle; Lu, Peng; Cullen, P J; Bourke, Paula

2018-08-01

Generation of wastewater is one of the main environmental sustainability issues across food sector industries. The constituents of food process effluents are often complex and require high energy and processing for regulatory compliance. Wastewater streams are the subject of microbiological and chemical criteria, and can have a significant eco-toxicological impact on the aquatic life. Thus, innovative treatment approaches are required to mitigate environmental impact in an energy efficient manner. Here, dielectric barrier discharge atmospheric cold plasma (ACP) was evaluated for control of key microbial indicators encountered in food industry effluent. This study also investigated the eco-toxicological impact of cold plasma treatment of the effluents using a range of aquatic bioassays. Continuous ACP treatment was applied to synthetic dairy and meat effluents. Microbial inactivation showed treatment time dependence with significant reduction in microbial populations within 120 s, and to undetectable levels after 300 s. Post treatment retention time emerged as critical control parameter which promoted ACP bacterial inactivation efficiency. Moreover, ACP treatment for 20 min achieved significant reduction (≥2 Log 10 ) in Bacillus megaterium endospores in wastewater effluent. Acute aquatic toxicity was assessed using two fish cell lines (PLHC-1 and RTG-2) and a crustacean model (Daphnia magna). Untreated effluents were toxic to the aquatic models, however, plasma treatment limited the toxic effects. Differing sensitivities were observed to ACP treated effluents across the different test bio-assays in the following order: PLHC-1 > RTG-2 ≥ D. magna; with greater sensitivity retained to plasma treated meat effluent than dairy effluent. The toxic effects were dependent on concentration and treatment time of the ACP treated effluent; with 30% cytotoxicity in D. magna and fish cells observed after 24 h of exposure to ACP treated effluent for concentrations up to 5%. The findings suggest the need to employ wider variety of aquatic organisms for better understanding and complete toxicity evaluation of long-term effects. The study demonstrates the potential to tailor ACP system parameters to control pertinent microbial targets (mono/poly-microbial, vegetative or spore form) found in complex and nutritious wastewater effluents whilst maintaining a safe eco-toxicity profile for aquatic species. Copyright © 2018 Elsevier B.V. All rights reserved.

Commercialization of Plasma-Assisted Technologies: The Indian Experience

NASA Astrophysics Data System (ADS)

John, P. I.

The paper describes an initiative by the Institute for Plasma Research (IPR), India in establishing links with the Indian industry for developing and commercialising advanced plasma-based industrial technologies. This has culminated in the creation of a self-financing technology development, incubation, demonstration and delivery facility. A business plan for converting the knowledge base to commercially viable technologies conceived technology as a product and the industry as the market and addressed issues like resistance to new technologies, the key role of entrepreneur, thrust areas and the necessity of technology incubation and delivery. Success of this strategy is discussed in a few case studies. We conclude by identifying the cost, environmental, strategic and techno-economic aspects, which would be the prime drivers for plasma-assisted manufacturing technology in India.

Development of an Organosilicon-Based Superhydrophobic/Icephobic Surface Using an Atmospheric Pressure Plasma Jet =

NASA Astrophysics Data System (ADS)

Asadollahi, Siavash

During the past few decades, plasma-based surface treatment methods have gained a lot of interest in various applications such as thin film deposition, surface etching, surface activation and/or cleaning, etc. Generally, in plasma-based surface treatment methods, high-energy plasma-generated species are utilized to modify the surface structure or the chemical composition of a substrate. Unique physical and chemical characteristics of the plasma along with the high controllability of the process makes plasma treatment approaches very attractive in several industries. Plasma-based treatment methods are currently being used or investigated for a number of practical applications, such as adhesion promotion in auto industry, wound management and cancer treatment in biomedical industry, and coating development in aerospace industry. In this study, a two-step procedure is proposed for the development of superhydrophobic/icephobic coatings based on atmospheric-pressure plasma treatment of aluminum substrates using air and nitrogen plasma. The effects of plasma parameters on various surface properties are studied in order to identify the optimum conditions for maximum coating efficiency against icing and wetting. In the first step, the interactions between air or nitrogen plasma and the aluminum surface are studied. It is shown that by reducing jet-to-substrate distance, air plasma treatment, unlike nitrogen plasma treatment, is capable of creating micro-porous micro-roughened structures on the surface, some of which bear a significant resemblance to the features observed in laser ablation of metals with short and ultra-short laser pulses. The formation of such structures in plasma treatment is attributed to a transportation of energy from the jet to the surface over a very short period of time, in the range of picoseconds to microseconds. This energy transfer is shown to occur through a streamer discharge from the rotating arc source in the jet body to a close proximity of the surface, and then through multiple seemingly random electric arcs on the surface. The formation of these discharges is facilitated by the near-infinite conductivity of the air plasma column. The micro-porous micro-roughened structure developed in this step is then used as the substrate for coating deposition. In the next step, first the plasma jet is slightly modified with a quartz tube surrounding the jet-head. This modification allows for ignition and maintenance of a very weak plasma while hindering the diffusion of oxygen into the plasma and thus increasing the amount of organic deposition on the surface. This is confirmed by the chemical characterization of the surfaces developed using the modified jet. Furthermore, it is shown that this modification can significantly affect surface morphology, leading to a finer surface structure with different levels of roughness. Hydrophobic materials are then deposited on the surface in the presence of HMDSO using nitrogen plasma. Several samples are prepared with different precursor flow rates, plasma generation powers and number of deposition passes. All coatings are characterized regarding their surface morphology, chemical composition, wetting behavior and icephobic characteristics. It is shown that at low precursor flow rates, coating deposition is not enough for a full coverage of the surface. On the other hand, at high flow rates coating deposition can completely cover the surface features originated from the air plasma treatment process, thus negating the effects of an important roughness level. At the median flow rate, which was identified to be 5 g/h, the coating can fully cover the surface while maintaining the pre-existing surface features. It is also shown that by increasing the number of plasma deposition passes, surface features become slightly larger while the amount of organic deposition on the surface increases. Finally, it is shown that in high plasma generation powers, the amount of oxide deposition on the surface increases, leading to lower contact angles and higher ice adhesion strengths. In order to estimate coatings' efficiency in practical applications, coating's stability against some environmental factors is studied. At first, the effects of multiple icing/deicing cycles on surface properties is investigated. SEM studies confirm the removal of the coating material from the surface in all cases after multiple icing/deicing cycles. However, it is shown that the sample resulting from the lowest generation power combined with median flow rate and 3 passes of plasma deposition can maintain its hydrophobicity and icephobicity for up to 10 cycles of icing/deicing. This sample is then exposed to an equivalent of up to 4 years of natural ultraviolet exposure and the effects of UV on surface properties were studied. It is suggested that ultraviolet exposure may be capable of reorganizing the organic functions in the coating structure, leading to shorter siloxane chains with denser methyl functionalization, thus affecting the wetting and icing behavior of the surface. Ice adhesion strength was shown to decrease significantly after the equivalent of 3 years of natural UV exposure. The procedure introduced in this thesis is a cheap, quick, and environmentally friendly method for development of superhydrophobic/icephobic coatings on aluminum substrates. Therefore, it can be easily implemented in several industrial applications where outdoor structures are expected to be exposed to severe icing events.

Research on Nitride Thin Films, Advanced Plasma Diagnostics, and Charged-Particle Processes

DTIC Science & Technology

2006-07-01

Additionally, these components are being placed closer to the point of use--requiring that they operate in extreme temperature environments ...reasons for component failure. To operate in extreme temperature environments , electronic and electrical components must withstand higher ambient...hybrid and plug-in hybrid-powered automobiles, heart defibrillators , and industrial equipment will benefit from a new generation of capacitors. High

Development of a TiAl Alloy by Spark Plasma Sintering

NASA Astrophysics Data System (ADS)

Couret, Alain; Voisin, Thomas; Thomas, Marc; Monchoux, Jean-Philippe

2017-12-01

Spark plasma sintering (SPS) is a consolidated powder metallurgy process for which the powder sintering is achieved through an applied electric current. The present article aims to describe the method we employed to develop a TiAl-based alloy adjusted for this SPS process. Owing to its enhanced mechanical properties, this alloy was found to fully match the industrial specifications for the aeronautic and automotive industries, which require a high strength at high temperature and a reasonably good ductility at room temperature. A step-by-step method was followed for this alloy development. Starting from a basic study on the as-SPSed GE alloy (Ti-48Al-2Cr-2Nb) in which the influence of the microstructure was studied, the microstructure-alloy composition relationships were then investigated to increase the mechanical properties. As a result of this study, we concluded that tungsten had to be the major alloying element to improve the resistance at high temperature and a careful addition of boron would serve the properties at room temperature. Thus, we developed the IRIS alloy (Ti-48Al-2W-0.08B). Its microstructure and mechanical properties are described here.

Highly tunable electronic properties in plasma-synthesized B-doped microcrystalline-to-amorphous silicon nanostructure for solar cell applications

NASA Astrophysics Data System (ADS)

Lim, J. W. M.; Ong, J. G. D.; Guo, Y.; Bazaka, K.; Levchenko, I.; Xu, S.

2017-10-01

Highly controllable electronic properties (carrier mobility and conductivity) were obtained in the sophisticatedly devised, structure-controlled, boron-doped microcrystalline silicon structure. Variation of plasma parameters enabled fabrication of films with the structure ranging from a highly crystalline (89.8%) to semi-amorphous (45.4%) phase. Application of the innovative process based on custom-designed, optimized, remote inductively coupled plasma implied all advantages of the plasma-driven technique and simultaneously avoided plasma-intrinsic disadvantages associated with ion bombardment and overheating. The high degree of SiH4, H2 and B2H6 precursor dissociation ensured very high boron incorporation into the structure, thus causing intense carrier scattering. Moreover, the microcrystalline-to-amorphous phase transition triggered by the heavy incorporation of the boron dopant with increasing B2H6 flow was revealed, thus demonstrating a very high level of the structural control intrinsic to the process. Control over the electronic properties through variation of impurity incorporation enabled tailoring the carrier concentrations over two orders of magnitude (1018-1020 cm-3). These results could contribute to boosting the properties of solar cells by paving the way to a cheap and efficient industry-oriented technique, guaranteeing a new application niche for this new generation of nanomaterials.

PREFACE: 14th Latin American Workshop on Plasma Physics (LAWPP 2011)

NASA Astrophysics Data System (ADS)

Bilbao, Luis; Minotti, Fernando; Kelly, Hector

2012-06-01

These proceedings present the written contributions from participants of the Latin American Workshop on Plasma Physics (LAWPP), which was held in Mar del Plata, Argentina, on 20-25 November 2011. This was the 14th session of the series of LAWPP biennial meetings, which started in 1982. The five-day scientific program of LAWPP 2011 consisted of 32 talks and various poster sessions, with the participation of 135 researchers from Argentina, Brazil, Canada, Chile, Colombia, Mexico, Puerto Rico, USA, Venezuela, as well as others from Europe and Asia. In addition, a School on Plasma Physics and a Workshop on Industrial Applications of Plasma Technology (AITP) were organized together with the main meeting. The five-day School held in the week previous to the meeting was intended for young scientists starting their research in Plasma Physics. On the other hand, the objective of the AITP Workshop was to enhance regional academic and industrial cooperation in the field of plasma assisted surface technology. Topics addressed at LAWPP 2011 included space plasmas, dusty plasmas, nuclear fusion, non-thermal plasmas, basic plasma processes, plasma simulation and industrial plasma applications. This variety of subjects is reflected in these proceedings, which the editors hope will result in enjoyable and fruitful reading for those interested in Plasma Physics. It is a pleasure to thank the Institutions that sponsored the meeting, as well as all the participants and collaborators for making this meeting possible. The Editors Luis Bilbao, Fernando Minotti and Hector Kelly LAWPP participants Participants of the 14th Latin American Workshop on Plasma Physics, 20-25 November 2011, Mar del Plata, Argentina International Scientific Committee Carlos Alejaldre, Spain María Virginia Alves, Brazil Ibere Caldas, Brazil Luis Felipe Delgado-Aparicio, Peru Mayo Villagrán, Mexico Kohnosuke Sato, Japan Héctor Kelly, Argentina Edberto Leal-Quirós, Puerto Rico George Morales, USA Julio Puerta, Venezuela Leopoldo Soto, Chile Michael Tendler, Sweden Carlos Varandas, Portugal Henry Riascos, Colombia Ivan Vargas-Blanco, Costa Rica Local Organizing Committee Luis Bilbao (Chairman) Fernando Minotti (Vice-Chairman) Luis Bernal, UNMDP Alejandro Clausse, PLADEMA-CNEA Graciela Gnavi, INFIP, CONICET-UBA Fausto Gratton, INFIP, CONICET-UBA Diana Grondona, INFIP, CONICET-UBA Héctor Kelly, INFIP, CONICET-UBA Adriana Márquez, INFIP, CONICET-UBA María Milanese, UNCPBA César Moreno, INFIP, CONICET-UBA Sponsors Instituto de Física del Plasma (INFIP) Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET) Comisión Nacional de Energía Atómica (CNEA) Agencia Nacional de Promoción Científica y Tecnológica (ANPCyT) Centro Latino-Americano de Física (CLAF) Universidad Nacional de Mar del Plata (UNMP) Universidad Nacional del Centro de la Provincia de Buenos Aires (UNICEN) Academia Nacional de Ciencias de Buenos Aires (ANCBA) Conference poster

Effect of Si on DC arc plasma generation from Al-Cr and Al-Cr-Si cathodes used in oxygen

NASA Astrophysics Data System (ADS)

Zhirkov, I.; Landälv, L.; Göthelid, E.; Ahlgren, M.; Eklund, P.; Rosen, J.

2017-02-01

Al2O3 alloyed with Cr is an important material for the tooling industry. It can be synthesized from an arc discharge using Al-Cr cathodes in an oxygen atmosphere. Due to formation of Al-rich oxide islands on the cathode surface, the arc process stability is highly sensitive to oxygen pressure. For improved stability, the use of Al0.70Cr0.25Si0.05 cathodes has previously been suggested, where Si may reduce island formation. Here, we have investigated the effect of Si by comparing plasma generation and thin film deposition from Al0.7Cr0.3 and Al0.7Cr0.25Si0.05 cathodes. Plasma ion composition, ion energies, ion charge states, neutral species, droplet formation, and film composition have been characterized at different O2 flow rates for arc currents of 60 and 90 A. Si and related compounds are detected in plasma ions and in plasma neutrals. Scanning electron microscopy and energy dispersive X-ray analysis show that the cathode composition and the film composition are the same, with Si present in droplets as well. The effect of Si on the process stability, ion energies, and ion charge states is found to be negligible compared to that of the arc current. The latter is identified as the most relevant parameter for tuning the properties of the reactive discharge. The present work increases the fundamental understanding of plasma generation in a reactive atmosphere, and provides input for the choice of cathode composition and process parameters in reactive DC arc synthesis.

Demonstration of Plasma Arc Environmental Technology Applications for the Demilitrization of DOD Stockpiles

NASA Technical Reports Server (NTRS)

Smith, Ed; Dee, P. E.; Zaghloul, Hany; Filius, Krag; Rivers, Tim

2000-01-01

Since 1989 the US Army Construction Engineering Research Laboratories (USACERL) have been active participants in the research and development towards establishing Plasma Arc Technology (PAT) as an efficient, economical, and safe hazardous waste immobilization tool. A plasma torch capable of generating high temperatures makes this technology a viable and powerful tool for the thermal destruction of various military industrial waste streams into an innocuous ceramic material no longer requiring hazardous waste landfill disposal. The emerging plasma environmental thermal treatment process has been used to safely and efficiently meet the waste disposal needs for various demilitarized components disposal needs, such as: (1) pyrotechnic smoke assemblies, (2) thermal batteries, (3) proximity fuses, (4) cartridge actuated devices (CADs), and (5) propellant actuated devices (PADs). MSE Technology Applications, Inc., (MSE) has proposed and fabricated a Mobile Plasma Treatment System to be a technology demonstrator for pilotscale mobile plasma waste processing. The system is capable of providing small-scale waste remediation services, and conducting waste stream applicability demonstrations. The Mobile Plasma Treatment System's innovative concept provides the flexibility to treat waste streams at numerous sites and sites with only a limited quantity of waste, yet too hazardous to transport to a regional fixed facility. The system was designed to be operated as skid mounted modules; consisting of a furnace module, controls module, offgas module, and ancillary systems module. All system components have been integrated to be operated from a single control station with both semi-continuous feeding and batch slag-pouring capability.

Comparative proteome analysis of egg yolk plasma proteins during storage.

PubMed

Gao, Dan; Qiu, Ning; Liu, Yaping; Ma, Meihu

2017-06-01

Physical changes such as chicken egg white thinning and egg yolk flattening occur during storage, implying a decline in egg quality. To reveal the deteriorative process related to chicken egg internal quality, a comparative proteomic method was used in this study to analyze the alterations in egg yolk plasma proteins at different storage times (0, 20 and 40 days) under an ambient temperature of 22 ± 2 °C. Using two-dimensional electrophoresis followed by matrix-assisted laser desorption/ionization time-of-flight tandem mass spectrometry, 33 protein spots representing 12 proteins were identified with significant (P < 0.05) alterations in abundance at different storage times. The proteins that showed significant changes in abundance included serum albumin, vitellogenin fragments, IgY chains, ovalbumin, ovoinhibitor, α 2 -macroglobulin-like protein 1-like, hemopexin, transthyretin, apolipoprotein A-I and β 2 -glycoprotein I precursor. Accelerating degradation for most egg yolk plasma proteins was observed after prolonged storage (from day 20 to day 40). It is likely that the increased degradation of protease inhibitors such as ovoinhibitor and α 2 -macroglobulin-like protein 1-like during prolonged storage lead to an imbalance of protease and antiprotease in egg yolk, which may play a key role in the degradation of egg yolk proteins. These findings will provide an insight into the effects of storage on egg yolk protein changes and give a deeper understanding of the deteriorative process of chicken egg yolk. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry.

Foundations of low-temperature plasma enhanced materials synthesis and etching

NASA Astrophysics Data System (ADS)

Oehrlein, Gottlieb S.; Hamaguchi, Satoshi

2018-02-01

Low temperature plasma (LTP)-based synthesis of advanced materials has played a transformational role in multiple industries, including the semiconductor industry, liquid crystal displays, coatings and renewable energy. Similarly, the plasma-based transfer of lithographically defined resist patterns into other materials, e.g. silicon, SiO2, Si3N4 and other electronic materials, has led to the production of nanometer scale devices that are the basis of the information technology, microsystems, and many other technologies based on patterned films or substrates. In this article we review the scientific foundations of both LTP-based materials synthesis at low substrate temperature and LTP-based isotropic and directional etching used to transfer lithographically produced resist patterns into underlying materials. We cover the fundamental principles that are the basis of successful application of the LTP techniques to technological uses and provide an understanding of technological factors that may control or limit material synthesis or surface processing with the use of LTP. We precede these sections with a general discussion of plasma surface interactions, the LTP-generated particle fluxes including electrons, ions, radicals, excited neutrals and photons that simultaneously contact and modify surfaces. The surfaces can be in the line of sight of the discharge or hidden from direct interaction for structured substrates. All parts of the article are extensively referenced, which is intended to help the reader study the topics discussed here in more detail.

In situ CF3 Detection in Low Pressure Inductive Discharges by Fourier Transform Infrared Spectroscopy

NASA Technical Reports Server (NTRS)

Kim, J. S.; Cappelli, M. A.; Sharma, S. P.; Arnold, J. O. (Technical Monitor)

1998-01-01

The detection of CF(x) (x=1-3) radicals in low pressure discharges using source gases such as CF4 and CHF3 is of importance to the understanding of their chemical structure and relevance in plasma based etching processes. These radicals are known to contribute to the formation of fluorocarbon polymer films, which affect the selectivity and anisotropy of etching. In this study, we present preliminary results of the quantitative measurement of trifluoromethyl radicals, CF3, in low pressure discharges. The discharge studied here is an inductively (transformer) coupled plasma (ICP) source in the GEC reference cell, operating on pure CF4 at pressures ranging from 10 - 100 mTorr, This plasma source generates higher electron number densities at lower operating pressures than obtainable with the parallel-plate capacitively coupled version of the GEC reference cell. Also, this expanded operating regime is more relevant to new generations of industrial plasma reactors being used by the microelectronics industry. Fourier transform infrared (FTIR) spectroscopy is employed to observe the absorption band of CF3 radicals in the electronic ground state X2Al in the region of 1233-1270/cm. The spectrometer is equipped with a high sensitivity HgCdTe (MCT) detector and has a fixed resolution of 0.125/cm. The CF3 concentrations are measured for a range of operating pressures and discharge power levels.

Oxidation of S(IV) in Seawater by Pulsed High Voltage Discharge Plasma with TiO2/Ti Electrode as Catalyst

NASA Astrophysics Data System (ADS)

Gong, Jianying; Zhang, Xingwang; Wang, Xiaoping; Lei, Lecheng

2013-12-01

Oxidation of S(IV) to S(VI) in the effluent of a flue gas desulfurization(FGD) system is very critical for industrial applications of seawater FGD. This paper reports a pulsed corona discharge oxidation process combined with a TiO2 photocatalyst to convert S(IV) to S(VI) in artificial seawater. Experimental results show that the oxidation of S(IV) in artificial seawater is enhanced in the pulsed discharge plasma process through the application of TiO2 coating electrodes. The oxidation rate of S(IV) using Ti metal as a ground electrode is about 2.0×10-4 mol · L-1 · min-1, the oxidation rate using TiO2/Ti electrode prepared by annealing at 500°C in air is 4.5×10-4 mol · L-1 · min-1, an increase with a factor 2.25. The annealing temperature for preparing TiO2/Ti electrode has a strong effect on the oxidation of S(IV) in artificial seawater. The results of in-situ emission spectroscopic analysis show that chemically active species (i.e. hydroxyl radicals and oxygen radicals) are produced in the pulsed discharge plasma process. Compared with the traditional air oxidation process and the sole plasma-induced oxidation process, the combined application of TiO2 photocatalysts and a pulsed high-voltage electrical discharge process is useful in enhancing the energy and conversion efficiency of S(IV) for the seawater FGD system.

14th High-Tech Plasma Processes Conference (HTPP 14)

NASA Astrophysics Data System (ADS)

2017-04-01

Preface The High-Tech Plasma Processes Conference (HTPP) is a bi-annual international conference based in Europe with topics encompassing the whole area of plasma processing science. This conference is open to all the international community in the world involved in plasma science and plasma technology. The aim of the conference is to bring different scientific communities together, facilitate the contacts between science, technology and industry and provide a platform for the exploration of both fundamental topics and new applications of plasmas. For this edition of HTPP, as was the case for the last, we have achieved a well balanced participation from the communities of both thermal and non-thermal plasma researchers. 75 people from 17 countries attended the conference with the total number of contributions being 74, consisting of 19 invited talks and 55 poster contributions. As a HTPP tradition a poster competition has been carried out during the conference. The winner of the poster competition was Fabrice Mavier from Université de Limoges, France with his paper “Pulsed arc plasma jet synchronized with drop-on-demand dispenser” All the participants also ejoyed the social program including an “unconventional” tour of the city, the visit to the famous Hofbräuhaus and the dinner at the Blutenburg, a beautiful inner-city castle. We have received papers corresponding to the contributions of HTPP-2014 that have been submitted for publication in this volume of Journal of Physics: Conference Series. Each submitted contribution has been peer reviewed and the Editors are very grateful to the referees for their careful support in improving the original manuscripts. In total, 18 manuscripts have been accepted for publication covering a range of topics of plasma processing science from plasma fundamentals to process applications through to experiments, diagnostics and modelling. We deeply thank the authors for their enthusiastic and high-grade contributions and we are convinced that this volume of Journal of Physics: Conference Series will be interesting for our community. Finally, we would like to thank the conference chairmen, the members of the steering committee, the international scientific committee, the local organizing committee, the organizing secretariat and the financial support from the conference sponsors that allowed the success of HTPP-2016. The Editors of the HTPP-2016 Proceedings Dr. Dirk Uhrlandt, head of the ISC Prof. Philippe Teulet Prof. Jochen Schein Neubiberg, 6th of March 2017

Plasmas for environmental issues: from hydrogen production to 2D materials assembly

NASA Astrophysics Data System (ADS)

Tatarova, E.; Bundaleska, N.; Sarrette, J. Ph; Ferreira, C. M.

2014-12-01

It is well recognized at present that the unique, high energy density plasma environment provides suitable conditions to dissociate/atomize molecules in remediation systems, to convert waste and biomass into sustainable energy sources, to purify water, to assemble nanostructures, etc. The remarkable plasma potential is based on its ability to supply simultaneously high fluxes of charged particles, chemically active molecules, radicals (e.g. O, H, OH), heat, highly energetic photons (UV and extreme UV radiation), and strong electric fields in intrinsic sheath domains. Due to this complexity, low-temperature plasma science and engineering is a huge, highly interdisciplinary field that spans many research disciplines and applications across many areas of our daily life and industrial activities. For this reason, this review deals only with some selected aspects of low-temperature plasma applications for a clean and sustainable environment. It is not intended to be a comprehensive survey, but just to highlight some important works and achievements in specific areas. The selected issues demonstrate the diversity of plasma-based applications associated with clean and sustainable ambiance and also show the unity of the underlying science. Fundamental plasma phenomena/processes/features are the common fibers that pass across all these areas and unify all these applications. Browsing through different topics, we try to emphasize these phenomena/processes/features and their uniqueness in an attempt to build a general overview. The presented survey of recently published works demonstrates that plasma processes show a significant potential as a solution for waste/biomass-to-energy recovery problems. The reforming technologies based on non-thermal plasma treatment of hydrocarbons show promising prospects for the production of hydrogen as a future clean energy carrier. It is also shown that plasmas can provide numerous agents that influence biological activity. The simultaneous generation in water discharges of intense UV radiation, shock waves and active radicals (OH, O, H2O2, etc), which are all effective agents against many biological pathogens and harmful chemicals, make these discharges suitable for decontamination, sterilization and purification processes. Moreover, plasmas appear as invaluable tools for the synthesis and engineering of new nanomaterials and in particular 2D materials. A brief overview on plasma-synthesized carbon nanostructures shows the high potential of such materials for energy conversion and storage applications.

LIBS: a potential tool for industrial/agricultural waste water analysis

NASA Astrophysics Data System (ADS)

Karpate, Tanvi; K. M., Muhammed Shameem; Nayak, Rajesh; V. K., Unnikrishnan; Santhosh, C.

2016-04-01

Laser Induced Breakdown Spectroscopy (LIBS) is a multi-elemental analysis technique with various advantages and has the ability to detect any element in real time. This technique holds a potential for environmental monitoring and various such analysis has been done in soil, glass, paint, water, plastic etc confirms the robustness of this technique for such applications. Compared to the currently available water quality monitoring methods and techniques, LIBS has several advantages, viz. no need for sample preparation, fast and easy operation, and chemical free during the process. In LIBS, powerful pulsed laser generates plasma which is then analyzed to get quantitative and qualitative details of the elements present in the sample. Another main advantage of LIBS technique is that it can perform in standoff mode for real time analysis. Water samples from industries and agricultural strata tend to have a lot of pollutants making it harmful for consumption. The emphasis of this project is to determine such harmful pollutants present in trace amounts in industrial and agricultural wastewater. When high intensity laser is made incident on the sample, a plasma is generated which gives a multielemental emission spectra. LIBS analysis has shown outstanding success for solids samples. For liquid samples, the analysis is challenging as the liquid sample has the chances of splashing due to the high energy of laser and thus making it difficult to generate plasma. This project also deals with determining the most efficient method for testing of water sample for qualitative as well as quantitative analysis using LIBS.

Abatement of sulfur hexafluoride emissions from the semiconductor manufacturing process by atmospheric-pressure plasmas.

PubMed

Lee, How Ming; Chang, Moo Been; Wu, Kuan Yu

2004-08-01

Sulfur hexafluoride (SF6) is an important gas for plasma etching processes in the semiconductor industry. SF6 intensely absorbs infrared radiation and, consequently, aggravates global warming. This study investigates SF6 abatement by nonthermal plasma technologies under atmospheric pressure. Two kinds of nonthermal plasma processes--dielectric barrier discharge (DBD) and combined plasma catalysis (CPC)--were employed and evaluated. Experimental results indicated that as much as 91% of SF6 was removed with DBDs at 20 kV of applied voltage and 150 Hz of discharge frequency for the gas stream containing 300 ppm SF6, 12% oxygen (O2), and 40% argon (Ar), with nitrogen (N2) as the carrier gas. Four additives, including Ar, O2, ethylene (C2H4), and H2O(g), are effective in enhancing SF6 abatement in the range of conditions studied. DBD achieves a higher SF6 removal efficiency than does CPC at the same operation condition. But CPC achieves a higher electrical energy utilization compared with DBD. However, poisoning of catalysts by sulfur (S)-containing species needs further investigation. SF6 is mainly converted to SOF2, SO2F4, sulfur dioxide (SO2), oxygen difluoride (OF2), and fluoride (F2). They do not cause global warming and can be captured by either wet scrubbing or adsorption. This study indicates that DBD and CPC are feasible control technologies for reducing SF6 emissions.

The plasma separation process as a pre-cursor for large scale radioisotope production

NASA Astrophysics Data System (ADS)

Stevenson, Nigel R.

2001-07-01

Radioisotope production generally employs either accelerators or reactors to convert stable (usually enriched) isotopes into the desired product species. Radioisotopes have applications in industry, environmental sciences, and most significantly in medicine. The production of many potentially useful radioisotopes is significantly hindered by the lack of availability or by the high cost of key enriched stable isotopes. To try and meet this demand, certain niche enrichment processes have been developed and commercialized. Calutrons, centrifuges, and laser separation processes are some of the devices and techniques being employed to produce large quantities of selective enriched stable isotopes. Nevertheless, the list of enriched stable isotopes in sufficient quantities remains rather limited and this continues to restrict the availability of many radioisotopes that otherwise could have a significant impact on society. The Plasma Separation Process is a newly available commercial technique for producing large quantities of a wide range of enriched isotopes and thereby holds promise of being able to open the door to producing new and exciting applications of radioisotopes in the future.

Plasma-Induced, Self-Masking, One-Step Approach to an Ultrabroadband Antireflective and Superhydrophilic Subwavelength Nanostructured Fused Silica Surface.

PubMed

Ye, Xin; Shao, Ting; Sun, Laixi; Wu, Jingjun; Wang, Fengrui; He, Junhui; Jiang, Xiaodong; Wu, Wei-Dong; Zheng, Wanguo

2018-04-25

In this work, antireflective and superhydrophilic subwavelength nanostructured fused silica surfaces have been created by one-step, self-masking reactive ion etching (RIE). Bare fused silica substrates with no mask were placed in a RIE vacuum chamber, and then nanoscale fluorocarbon masks and subwavelength nanostructures (SWSs) automatically formed on these substrate after the appropriate RIE plasma process. The mechanism of plasma-induced self-masking SWS has been proposed in this paper. Plasma parameter effects on the morphology of SWS have been investigated to achieve perfect nanocone-like SWS for excellent antireflection, including process time, reactive gas, and pressure of the chamber. Optical properties, i.e., antireflection and optical scattering, were simulated by the finite difference time domain (FDTD) method. Calculated data agree well with the experiment results. The optimized SWS show ultrabroadband antireflective property (up to 99% from 500 to 1360 nm). An excellent improvement of transmission was achieved for the deep-ultraviolet (DUV) range. The proposed low-cost, highly efficient, and maskless method was applied to achieve ultrabroadband antireflective and superhydrophilic SWSs on a 100 mm optical window, which promises great potential for applications in the automotive industry, goggles, and optical devices.

Synthesis and Phase Stability of Scandia, Gadolinia, and Ytterbia Co-doped Zirconia for Thermal Barrier Coating Application

NASA Astrophysics Data System (ADS)

Li, Qi-Lian; Cui, Xiang-Zhong; Li, Shu-Qing; Yang, Wei-Hua; Wang, Chun; Cao, Qian

2015-01-01

Scandia, gadolinia, and ytterbia co-doped zirconia (SGYZ) ceramic powder was synthesized by chemical co-precipitation and calcination processes for application in thermal barrier coatings to promote the durability of gas turbines. The ceramic powder was agglomerated and sintered at 1150 °C for 2 h, and the powder exhibited good flowability and apparent density to be suitable for plasma spraying process. The microstructure, morphology and phase stability of the powder and plasma-sprayed SGYZ coatings were analyzed by means of scanning electron microscope and x-ray diffraction. Thermal conductivity of plasma-sprayed SGYZ coatings was measured. The results indicated that the SGYZ ceramic powder and the coating exhibit excellent stability to retain single non-transformable tetragonal zirconia even after high temperature (1400 °C) exposure for 500 h and do not undergo a tetragonal-to-monoclinic phase transition upon cooling. Furthermore, the plasma-sprayed SGYZ coating also exhibits lower thermal conductivity than yttria stabilized zirconia coating currently used in gas turbine engine industry. SGYZ can be explored as a candidate material of ultra-high temperature thermal barrier coating for advanced gas turbine engines.

Deposition of hard elastic hydrogenated fullerenelike carbon films

NASA Astrophysics Data System (ADS)

Wang, Zhou; Zhang, Junyan

2011-05-01

Hydrogenated fullerenelike carbon (H-FLC) films, with high hardness of 41.7 ± 1.4 GPa and elastic recovery of ˜75.1%, have been uniformly deposited at low temperature by pulse direct current plasma enhanced chemical vapor deposition (pulse DC PECVD). The superior mechanical properties of the H-FLC films are attributed to the unique curvature and interconnection of graphitic basal planes. We propose the fullerenelike structures are formed in the far nonequilibrium pulse plasma environment and stabilized in the sequential fast quenching process. It is expected that the facile deposition of H-FLC films will promote the large-scale low-temperature preparation of engineering protective films for industrial applications.

Static properties and moisture content properties of polyester fabrics modified by plasma treatment and chemical finishing

NASA Astrophysics Data System (ADS)

Kan, C. W.; Yuen, C. W. M.

2008-01-01

Low temperature plasma treatment has been conducted in textile industry and has some success in the dyeing and finishing processes. In this paper, an attempt was made to apply low temperature plasma treatment to improve the anti-static property of polyester fabric. The polyester fabrics were treated under different conditions using low temperature plasma. An Orthogonal Array Testing Strategy was employed to determine the optimum treatment condition. After low temperature plasma treatment, the polyester fabrics were evaluated with different characterisation methods. Under the observation of scanning electron microscope, the surface structure of low temperature plasma-treated polyester fabric was seriously altered. This provided more capacity for polyester to capture moisture and hence increase the dissipation of static charges. The relationship between moisture content and half-life decay time for static charges was studied and the results showed that the increment of moisture content would result in shortening the time for the dissipation of static charges. Moreover, there was a great improvement in the anti-static property of the low temperature plasma-treated polyester fabric after comparing with that of the polyester fabric treated with commercial anti-static finishing agent.

Plasma gasification of refuse derived fuel in a single-stage system using different gasifying agents.

PubMed

Agon, N; Hrabovský, M; Chumak, O; Hlína, M; Kopecký, V; Masláni, A; Bosmans, A; Helsen, L; Skoblja, S; Van Oost, G; Vierendeels, J

2016-01-01

The renewable evolution in the energy industry and the depletion of natural resources are putting pressure on the waste industry to shift towards flexible treatment technologies with efficient materials and/or energy recovery. In this context, a thermochemical conversion method of recent interest is plasma gasification, which is capable of producing syngas from a wide variety of waste streams. The produced syngas can be valorized for both energetic (heat and/or electricity) and chemical (ammonia, hydrogen or liquid hydrocarbons) end-purposes. This paper evaluates the performance of experiments on a single-stage plasma gasification system for the treatment of refuse-derived fuel (RDF) from excavated waste. A comparative analysis of the syngas characteristics and process yields was done for seven cases with different types of gasifying agents (CO2+O2, H2O, CO2+H2O and O2+H2O). The syngas compositions were compared to the thermodynamic equilibrium compositions and the performance of the single-stage plasma gasification of RDF was compared to that of similar experiments with biomass and to the performance of a two-stage plasma gasification process with RDF. The temperature range of the experiment was from 1400 to 1600 K and for all cases, a medium calorific value syngas was produced with lower heating values up to 10.9 MJ/Nm(3), low levels of tar, high levels of CO and H2 and which composition was in good agreement to the equilibrium composition. The carbon conversion efficiency ranged from 80% to 100% and maximum cold gas efficiency and mechanical gasification efficiency of respectively 56% and 95%, were registered. Overall, the treatment of RDF proved to be less performant than that of biomass in the same system. Compared to a two-stage plasma gasification system, the produced syngas from the single-stage reactor showed more favourable characteristics, while the recovery of the solid residue as a vitrified slag is an advantage of the two-stage set-up. Copyright © 2015 Elsevier Ltd. All rights reserved.

Impulse Plasma In Surface Engineering - a review

NASA Astrophysics Data System (ADS)

Zdunek, K.; Nowakowska-Langier, K.; Chodun, R.; Okrasa, S.; Rabinski, M.; Dora, J.; Domanowski, P.; Halarowicz, J.

2014-11-01

The article describes the view of the plasma surface engineering, assuming the role of non-thermal energy effects in the synthesis of materials and coatings deposition. In the following study it was underlined that the vapor excitation through the application of an electric field during coatings deposition gives new possibilities for coatings formation. As an example the IPD method was chosen. During the IPD (Impulse Plasma Deposition) the impulse plasma is generated in the coaxial accelerator by strong periodic electrical pulses. The impulse plasma is distributed in the form of energetic plasma pockets. Due to the almost completely ionization of gas, the nucleation of new phases takes place on ions directly in the plasma itself. As a result the coatings of metastable materials with nano-amorphous structure and excellent adhesion to the non-heated intentionally substrates could be deposited. Recently the novel way of impulse plasma generation during the coatings deposition was proposed and developed by our group. An efficient tool for plasma process control, the plasma forming gas injection to the interelectrode space was used. Periodic changing the gas pressure results in increasing both the degree of dispersion and the dynamics of the plasma pulses. The advantage of the new technique in deposition of coatings with exceptionally good properties has been demonstrated in the industrial scale not only in the case of the IPD method but also in the case of very well known magnetron sputtering method.

Ion behaviour in pulsed plasma regime by means of Time-resolved energy mass spectroscopy (TREMS) applied to an industrial radiofrequency Plasma Immersion Ion Implanter PULSION registered

DOE Office of Scientific and Technical Information (OSTI.GOV)

Carrere, M.; Kaeppelin, V.; Torregrosa, F.

2006-11-13

In order to face the requirements for P+/N junctions requested for < 45 nm ITRS nodes, new doping techniques are studied. Among them Plasma Immersion Ion Implantation (PIII) has been largely studied. IBS has designed and developed its own PIII machine named PULSION registered . This machine is using a pulsed plasma. As other modem technological applications of low pressure plasma, PULSION registered needs a precise control over plasma parameters in order to optimise process characteristics. In order to improve pulsed plasma discharge devoted to PIII, a nitrogen pulsed plasma has been studied in the inductively coupled plasma (ICP) ofmore » PULSION registered and an argon pulsed plasma has been studied in the helicon discharge of the laboratory reactor of LPIIM (PHYSIS). Measurements of the Ion Energy Distribution Function (IEDF) with EQP300 (Hidden) have been performed in both pulsed plasma. This study has been done for different energies which allow to reconstruct the IEDF resolved in time (TREMS). By comparing these results, we found that the beginning of the plasma pulse, named ignition, exhaust at least three phases, or more. All these results allowed us to explain plasma dynamics during the pulse while observing transitions between capacitive and inductive coupling. This study leads in a better understanding of changes in discharge parameters as plasma potential, electron temperature, ion density.« less

Ion energy distributions in bipolar pulsed-dc discharges of methane measured at the biased cathode

NASA Astrophysics Data System (ADS)

Corbella, C.; Rubio-Roy, M.; Bertran, E.; Portal, S.; Pascual, E.; Polo, M. C.; Andújar, J. L.

2011-02-01

The ion fluxes and ion energy distributions (IED) corresponding to discharges in methane (CH4) were measured in time-averaged mode with a compact retarding field energy analyser (RFEA). The RFEA was placed on a biased electrode at room temperature, which was powered by either radiofrequency (13.56 MHz) or asymmetric bipolar pulsed-dc (250 kHz) signals. The shape of the resulting IED showed the relevant populations of ions bombarding the cathode at discharge parameters typical in the material processing technology: working pressures ranging from 1 to 10 Pa and cathode bias voltages between 100 and 200 V. High-energy peaks in the IED were detected at low pressures, whereas low-energy populations became progressively dominant at higher pressures. This effect is attributed to the transition from collisionless to collisional regimes of the cathode sheath as the pressure increases. On the other hand, pulsed-dc plasmas showed broader IED than RF discharges. This fact is connected to the different working frequencies and the intense peak voltages (up to 450 V) driven by the pulsed power supply. This work improves our understanding in plasma processes at the cathode level, which are of crucial importance for the growth and processing of materials requiring controlled ion bombardment. Examples of industrial applications with these requirements are plasma cleaning, ion etching processes during fabrication of microelectronic devices and plasma-enhanced chemical vapour deposition of hard coatings (diamond-like carbon, carbides and nitrides).

Improving by postoxidation of corrosion resistance of plasma nitrocarburized AISI 316 stainless steels

NASA Astrophysics Data System (ADS)

Yenilmez, A.; Karakan, M.; Çelik, İ.

2017-01-01

Austenitic stainless steels are widely used in several industries such as chemistry, food, health and space due to their perfect corrosion resistance. However, in addition to corrosion resistance, the mechanic and tribological features such as wear resistance and friction are required to be good in the production and engineering of this type of machines, equipment and mechanic parts. In this study, ferritic (FNC) and austenitic (ANC) nitrocarburizing were applied on AISI 316 stainless steel specimens with perfect corrosion resistance in the plasma environment at the definite time (4 h) and constant gas mixture atmosphere. In order to recover corrosion resistance which was deteriorated after nitrocarburizing again, plasma postoxidation process (45 min) was applied. After the duplex treatment, the specimens' structural analyses with XRD and SEM methods, corrosion analysis with polarization method and surface hardness with microhardness method were examined. At the end of the studies, AISI 316 surface hardness of stainless steel increased with nitrocarburizing process, but the corrosion resistance was deteriorated with FNC (570 °C) and ANC (670 °C) nitrocarburizing. With the following of the postoxidation treatment, it was detected that the corrosion resistance became better and it approached its value before the process.

Method of fabricating silicon carbide coatings on graphite surfaces

DOEpatents

Varacalle, D.J. Jr.; Herman, H.; Burchell, T.D.

1994-07-26

The vacuum plasma spray process produces well-bonded, dense, stress-free coatings for a variety of materials on a wide range of substrates. The process is used in many industries to provide for the excellent wear, corrosion resistance, and high temperature behavior of the fabricated coatings. In this application, silicon metal is deposited on graphite. This invention discloses the optimum processing parameters for as-sprayed coating qualities. The method also discloses the effect of thermal cycling on silicon samples in an inert helium atmosphere at about 1,600 C which transforms the coating to silicon carbide. 3 figs.

Method of fabricating silicon carbide coatings on graphite surfaces

DOEpatents

Varacalle, Jr., Dominic J.; Herman, Herbert; Burchell, Timothy D.

1994-01-01

The vacuum plasma spray process produces well-bonded, dense, stress-free coatings for a variety of materials on a wide range of substrates. The process is used in many industries to provide for the excellent wear, corrosion resistance, and high temperature behavior of the fabricated coatings. In this application, silicon metal is deposited on graphite. This invention discloses the optimum processing parameters for as-sprayed coating qualities. The method also discloses the effect of thermal cycling on silicon samples in an inert helium atmosphere at about 1600.degree.C. which transforms the coating to silicon carbide.

High density plasma etching of magnetic devices

NASA Astrophysics Data System (ADS)

Jung, Kee Bum

Magnetic materials such as NiFe (permalloy) or NiFeCo are widely used in the data storage industry. Techniques for submicron patterning are required to develop next generation magnetic devices. The relative chemical inertness of most magnetic materials means they are hard to etch using conventional RIE (Reactive Ion Etching). Therefore ion milling has generally been used across the industry, but this has limitations for magnetic structures with submicron dimensions. In this dissertation, we suggest high density plasmas such as ECR (Electron Cyclotron Resonance) and ICP (Inductively Coupled Plasma) for the etching of magnetic materials (NiFe, NiFeCo, CoFeB, CoSm, CoZr) and other related materials (TaN, CrSi, FeMn), which are employed for magnetic devices like magnetoresistive random access memories (MRAM), magnetic read/write heads, magnetic sensors and microactuators. This research examined the fundamental etch mechanisms occurring in high density plasma processing of magnetic materials by measuring etch rate, surface morphology and surface stoichiometry. However, one concern with using Cl2-based plasma chemistry is the effect of residual chlorine or chlorinated etch residues remaining on the sidewalls of etched features, leading to a degradation of the magnetic properties. To avoid this problem, we employed two different processing methods. The first one is applying several different cleaning procedures, including de-ionized water rinsing or in-situ exposure to H2, O2 or SF6 plasmas. Very stable magnetic properties were achieved over a period of ˜6 months except O2 plasma treated structures, with no evidence of corrosion, provided chlorinated etch residues were removed by post-etch cleaning. The second method is using non-corrosive gas chemistries such as CO/NH3 or CO2/NH3. There is a small chemical contribution to the etch mechanism (i.e. formation of metal carbonyls) as determined by a comparison with Ar and N2 physical sputtering. The discharge should be NH3-rich to achieve the highest etch rates. Several different mask materials were investigated, including photoresist, thermal oxide and deposited oxide. Photoresist etches very rapidly in CO/NH 3 and use of a hard mask is necessary to achieve pattern transfer. Due to its physically dominated nature, the CO/NH3 chemistry appears suited to shallow etch depth (≤0.5mum) applications, but mask erosion leads to sloped feature sidewalls for deeper features.

Preliminary Study of Thermal Treatment of Coke Wastewater Sludge Using Plasma Torch

NASA Astrophysics Data System (ADS)

Li, Mingshu; Li, Shengli; Sun, Demao; Liu, Xin; Feng, Qiubao

2016-10-01

Thermal plasma was applied for the treatment of coke wastewater sludge derived from the steel industry in order to investigate the feasibility of the safe treatment and energy recovery of the sludge. A 30 kW plasma torch system was applied to study the vitrification and gas production of coke wastewater sludge. Toxicity leaching results indicated that the sludge treated via the thermal plasma process converted into a vitrified slag which resisted the leaching of heavy metals. CO2 was utilized as working gas to study the production and heat energy of the syngas. The heating value of the gas products by thermal plasma achieved 8.43 kJ/L, indicating the further utilization of the gas products. Considering the utilization of the syngas and recovery heat from the gas products, the estimated treatment cost of coke wastewater sludge via plasma torch was about 0.98 CNY/kg sludge in the experiment. By preliminary economic analysis, the dehydration cost takes an important part of the total sludge treatment cost. The treatment cost of the coke wastewater sludge with 50 wt.% moisture was calculated to be about 1.45 CNY/kg sludge dry basis. The treatment cost of the coke wastewater sludge could be effectively controlled by decreasing the water content of the sludge. These findings suggest that an economic dewatering pretreatment method could be combined to cut the total treatment cost in an actual treatment process.

Demonstration of Plasma Arc Environmental Technology Applications for the Demilitarization of DOD Stockpiles

NASA Technical Reports Server (NTRS)

Smith, Ed; Zaghloul, Hany; Filius, Krag; Rivers, Tim

2000-01-01

Since 1989 the U.S. Army Construction Engineering Research Laboratories (USACERL) have been active participants in the research and development toward establishing Plasma Arc Technology (PAT) as an efficient, economical, and safe hazardous waste immobilization tool. A plasma torch capable of generating high temperatures makes this technology a viable and powerful tool for the thermal destruction of various military industrial waste streams into an innocuous ceramic material no longer requiring hazardous waste landfill (Class 1) disposal. The emerging pl asma environmental thermal treatment process, has been used to safely and efficiently meet the waste disposal needs for various demilitarized components disposal needs, such as: pyrotechnic smoke assemblies, thermal batteries, proximity fuses, cartridge actuated devices (CAD's), and propellant actuated devices (PAD's). MSE Technology Applications, Inc., (MSE) has proposed and fabricated a Mobile Plasma Treatment System to be a technology demonstrator for pilot-scale mobile plasma waste processing. The system is capable of providing small-scale waste remediation services, and conducting waste stream applicability demonstrations. The Mobile Plasma Treatment System's innovative concept provides the flexibility to treat waste streams at numerous sites and sites with only a limited quantity of waste, yet too hazardous to transport to a regional fixed facility. The system was designed to be operated as skid mounted modules; consisting of a furnace module, controls module, offgas module, and ancillary systems module. All system components have been integrated to be operated from a single control station with both semi-continuous feeding and batch slag-pouring capability.

Studies of the influence of nonequilibrium plasma thermal exposure on the characteristics of the capillary-porous polymer material

NASA Astrophysics Data System (ADS)

Makhotkina, L. Yu; Khristoliubova, V. I.

2017-01-01

Capillary-porous materials, which include natural macromolecular tanning material, are exposed to a number of factors during the treatment by a nonequilibrium plasma. Plasma particles exchange the charge and energy with the atoms of the material during the interaction of the plasma with the surface. The results of treatment are desorption of atoms and molecules from the body surface, sputtering and evaporation of material’s particles, changes of the structure and phase state. In real terms during the modification of solids by nonequilibrium low-temperature plasma thermal effect influences the process. The energy supplied from the discharge during the process with low pressure, which is converted into heat, is significantly less than during the atmospheric pressure, but the thermal stability of high-molecular compounds used in the manufacture of materials and products of the tanning industry, is very limited and depends on the duration of the effect of temperature. Even short heating of hydrophilic polymers (proteins) (100-180 °C) causes a change in their properties. It decreases the collagen ability to absorb water vapor, to swell in water, acids, alkalis, and thus decreases their durability. Prolonged heating leads to a deterioration of the physical and mechanical properties. Higher heating temperatures it leads to the polymer degradation. The natural leather temperature during plasma exposure does not rise to a temperature of collagen degradation and does not result in changes of physical phase of the dermis. However, the thermal plasma exposure must be considered, since the high temperatures influence on physical and mechanical properties.

Development of a Premium Quality Plasma-derived IVIg (IQYMUNE®) Utilizing the Principles of Quality by Design-A Worked-through Case Study.

PubMed

Paolantonacci, Philippe; Appourchaux, Philippe; Claudel, Béatrice; Ollivier, Monique; Dennett, Richard; Siret, Laurent

2018-01-01

Polyvalent human normal immunoglobulins for intravenous use (IVIg), indicated for rare and often severe diseases, are complex plasma-derived protein preparations. A quality by design approach has been used to develop the Laboratoire Français du Fractionnement et des Biotechnologies new-generation IVIg, targeting a high level of purity to generate an enhanced safety profile while maintaining a high level of efficacy. A modular approach of quality by design was implemented consisting of five consecutive steps to cover all the stages from the product design to the final product control strategy.A well-defined target product profile was translated into 27 product quality attributes that formed the basis of the process design. In parallel, a product risk analysis was conducted and identified 19 critical quality attributes among the product quality attributes. Process risk analysis was carried out to establish the links between process parameters and critical quality attributes. Twelve critical steps were identified, and for each of these steps a risk mitigation plan was established.Among the different process risk mitigation exercises, five process robustness studies were conducted at qualified small scale with a design of experiment approach. For each process step, critical process parameters were identified and, for each critical process parameter, proven acceptable ranges were established. The quality risk management and risk mitigation outputs, including verification of proven acceptable ranges, were used to design the process verification exercise at industrial scale.Finally, the control strategy was established using a mix, or hybrid, of the traditional approach plus elements of the quality by design enhanced approach, as illustrated, to more robustly assign material and process controls and in order to securely meet product specifications.The advantages of this quality by design approach were improved process knowledge for industrial design and process validation and a clear justification of the process and product specifications as a basis for control strategy and future comparability exercises. © PDA, Inc. 2018.

PumpKin: A tool to find principal pathways in plasma chemical models

NASA Astrophysics Data System (ADS)

Markosyan, A. H.; Luque, A.; Gordillo-Vázquez, F. J.; Ebert, U.

2014-10-01

PumpKin is a software package to find all principal pathways, i.e. the dominant reaction sequences, in chemical reaction systems. Although many tools are available to integrate numerically arbitrarily complex chemical reaction systems, few tools exist in order to analyze the results and interpret them in relatively simple terms. In particular, due to the large disparity in the lifetimes of the interacting components, it is often useful to group reactions into pathways that recycle the fastest species. This allows a researcher to focus on the slow chemical dynamics, eliminating the shortest timescales. Based on the algorithm described by Lehmann (2004), PumpKin automates the process of finding such pathways, allowing the user to analyze complex kinetics and to understand the consumption and production of a certain species of interest. We designed PumpKin with an emphasis on plasma chemical systems but it can also be applied to atmospheric modeling and to industrial applications such as plasma medicine and plasma-assisted combustion.

Killing Microorganisms with the One Atmosphere Uniform Glow Discharge Plasma

NASA Astrophysics Data System (ADS)

South, Suzanne; Kelly-Wintenberg, Kimberly; Montie, T. C.; Reece Roth, J.; Sherman, Daniel; Morrison, Jim; Chen, Zhiyu; Karakaya, Fuat

2000-10-01

There is an urgent need for the development of new technologies for sterilization and decontamination in the fields of healthcare and industrial and food processing that are safe, cost-effective, broad-spectrum, and not deleterious to samples. One technology that meets these criteria is the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP). The OAUGDP operates in air and produces uniform plasma without filamentary discharges at room temperature, making this technology advantageous for sterilization of heat sensitive materials. The OAUGDP operates in a frequency band determined by the ion trapping mechanisms provided that, for air, the electric field is above 8.5kV/cm. The OAUGDP efficiently generates plasma reactive oxygen species (ROS) including atomic oxygen and oxygen free radicals without the requirement of a vacuum system. We have demonstrated the efficacy of the OAUGDP in killing microorganisms including bacteria, yeast, viruses, and spores in seconds to minutes on a variety of surfaces such as glass, films and fabrics, stainless steel, paper, and agar.

Theoretical And Experimental Investigations On The Plasma Of A CO2 High Power Laser

NASA Astrophysics Data System (ADS)

Abel, W.; Wallter, B.

1984-03-01

The CO2 high power laser is increasingly used in material processing. This application of the laser has to meet some requirements: at one hand the laser is a tool free of wastage, but at the other hand is to guarantee that the properties of that tool are constant in time. Therefore power, geometry and mode of the beam have to be stable over long intervalls, even if the laser is used in rough industrial environment. Otherwise laser material processing would not be competitive. The beam quality is affected by all components of the laser - by the CO2 plasma and its IR - amplification, by the resonator which at last generates the beam by optical feedback, and also by the electric power supply whose effects on the plasma may be measured at the laser beam. A transversal flow laser has been developed at the Technical University of Vienna in cooperation with VOest-Alpine AG, Linz (Austria). This laser produces 1 kW of beam power with unfolded resonator. It was subject to investigations presented in this paper.

EFFECTS OF LASER RADIATION ON MATTER. LASER PLASMA: Doppler backscattered-signal diagnostics of laser-induced surface hydrodynamic processes

NASA Astrophysics Data System (ADS)

Gordienko, Vyacheslav M.; Kurochkin, Nikolay N.; Markov, V. N.; Panchenko, Vladislav Ya; Pogosov, G. A.; Chastukhin, E. M.

1995-02-01

A method is proposed for on-line monitoring of laser industrial processing. The method is based on optical heterodyne measurements of the Doppler backscattering signal generated in the interaction zone. Qualitative and quantitative information on hydrodynamic flows in the interaction zone can be obtained. A report is given of measurements, carried out at cw CO2 laser radiation intensities up to 1 kW cm-2, on the surfaces of a number of condensed materials irradiated in the monostatic interaction configuration.

An investigation into the role of metastable states on excited populations of weakly ionized argon plasmas, with applications for optical diagnostics

NASA Astrophysics Data System (ADS)

Arnold, Nicholas; Loch, Stuart; Ballance, Connor; Thomas, Ed

2017-10-01

Low temperature plasmas (Te < 10 eV) are ubiquitous in the medical, industrial, basic, and dusty plasma communities, and offer an opportunity for researchers to gain a better understanding of atomic processes in plasmas. Here, we report on a new atomic dataset for neutral and low charge states of argon, from which rate coefficients and cross-sections for the electron-impact excitation of neutral argon are determined. We benchmark by comparing with electron impact excitation cross-sections available in the literature, with very good agreement. We have used the Atomic Data and Analysis Structure (ADAS) code suite to calculate a level-resolved, generalized collisional-radiative (GCR) model for line emission in low temperature argon plasmas. By combining our theoretical model with experimental electron temperature, density, and spectral measurements from the Auburn Linear eXperiment for Instability Studies (ALEXIS), we have developed diagnostic techniques to measure metastable fraction, electron temperature, and electron density. In the future we hope to refine our methods, and extend our model to plasmas other than ALEXIS. Supported by the U.S. Department of Energy. Grant Number: DE-FG02-00ER54476.

X-Ray Detector for 1 to 30 keV

NASA Technical Reports Server (NTRS)

Alcorn, G.; Jackson, J., Jr; Grant, P.; Marshall, F.

1983-01-01

Array of silicon X-ray detecting diodes measures photon energy and provides image of X-ray pattern. Regardless of thickness of new X-ray detector, depletion region extends through it. Impinging X-rays generate electrons in quantities proportional to X-ray energy. X-ray detector is mated to chargecoupled-device array for image generation and processing. Useful in industrial part inspection, pulsed-plasma research and medical application.

Impact of cold plasma on Citrobacter freundii in apple juice: inactivation kinetics and mechanisms.

PubMed

Surowsky, Björn; Fröhling, Antje; Gottschalk, Nathalie; Schlüter, Oliver; Knorr, Dietrich

2014-03-17

Various studies have shown that cold plasma is capable of inactivating microorganisms located on a variety of food surfaces, food packaging materials and process equipment under atmospheric pressure conditions; however, less attention has been paid to the impact of cold plasma on microorganisms in liquid foodstuffs. The present study investigates cold plasma's ability to inactivate Citrobacter freundii in apple juice. Optical emission spectroscopy (OES) and temperature measurements were performed to characterise the plasma source. The plasma-related impact on microbial loads was evaluated by traditional plate count methods, while morphological changes were determined using scanning electron microscopy (SEM). Physiological property changes were obtained through flow cytometric measurements (membrane integrity, esterase activity and membrane potential). In addition, mathematical modelling was performed in order to achieve a reliable prediction of microbial inactivation and to establish the basis for possible industrial implementation. C. freundii loads in apple juice were reduced by about 5 log cycles after a plasma exposure of 480s using argon and 0.1% oxygen plus a subsequent storage time of 24h. The results indicate that a direct contact between bacterial cells and plasma is not necessary for achieving successful inactivation. The plasma-generated compounds in the liquid, such as H2O2 and most likely hydroperoxy radicals, are particularly responsible for microbial inactivation. Copyright © 2014. Published by Elsevier B.V.

Direct integration of polycrystalline graphene into light emitting diodes by plasma-assisted metal-catalyst-free synthesis.

PubMed

Kim, Yong Seung; Joo, Kisu; Jerng, Sahng-Kyoon; Lee, Jae Hong; Moon, Daeyoung; Kim, Jonghak; Yoon, Euijoon; Chun, Seung-Hyun

2014-03-25

The integration of graphene into devices is a challenging task because the preparation of a graphene-based device usually includes graphene growth on a metal surface at elevated temperatures (∼1000 °C) and a complicated postgrowth transfer process of graphene from the metal catalyst. Here we report a direct integration approach for incorporating polycrystalline graphene into light emitting diodes (LEDs) at low temperature by plasma-assisted metal-catalyst-free synthesis. Thermal degradation of the active layer in LEDs is negligible at our growth temperature, and LEDs could be fabricated without a transfer process. Moreover, in situ ohmic contact formation is observed between DG and p-GaN resulting from carbon diffusion into the p-GaN surface during the growth process. As a result, the contact resistance is reduced and the electrical properties of directly integrated LEDs outperform those of LEDs with transferred graphene electrodes. This relatively simple method of graphene integration will be easily adoptable in the industrialization of graphene-based devices.

Spectroscopy Study of Ar + CO2 Plasmas in ASTRAL.

NASA Astrophysics Data System (ADS)

Munoz, Jorge; Boivin, Robert; Kamar, Ola; Loch, Stuart; Ballance, Connor

2006-10-01

A spectroscopy study of the ASTRAL (Auburn Steady sTate Research fAciLity) helicon plasma source running Ar + CO2 gas mix is presented. ASTRAL produces Ar plasmas: ne = 10^10 to 10^13 cm-3, Te = 2 to 10 eV and Ti = 0.03 to 0.5 eV. A series of 7 large coils produce an axial magnetic field up to 1.3 kGauss. A fractional helix antenna is used to introduce rf power up to 2 kWatt. A spectrometer which features a 0.33 m Criss-Cross monochromator and a CCD camera is used for this study. Very different plasmas are produced following the relative importance of CO2 in the gas mixture. At low CO2 concentration, the plasmas are similar to those obtained with pure Ar with weak CO2, CO2^+, CO and CO^+ bands. The usual blue plasma core associated with intense Ar II transitions is observed with however a significant white glow coming from the outer plasma regions. At higher CO2 concentration, the plasma becomes essentially molecular and can be described as an intense white plasma column. Molecular dissociative processes associated with the production of strong C and O atomic lines are observed under specific plasma conditions. The atomic spectral lines are compared with ADAS modeling results. This study indicates the possible advantages of using a helicon source to control the CO2 plasma chemistry for industrial applications.

PREFACE: 2nd International Meeting for Researchers in Materials and Plasma Technology

NASA Astrophysics Data System (ADS)

Niño, Ely Dannier V.

2013-11-01

These proceedings present the written contributions of the participants of the 2nd International Meeting for Researchers in Materials and Plasma Technology, 2nd IMRMPT, which was held from February 27 to March 2, 2013 at the Pontificia Bolivariana Bucaramanga-UPB and Santander and Industrial - UIS Universities, Bucaramanga, Colombia, organized by research groups from GINTEP-UPB, FITEK-UIS. The IMRMPT, was the second version of biennial meetings that began in 2011. The three-day scientific program of the 2nd IMRMPT consisted in 14 Magisterial Conferences, 42 Oral Presentations and 48 Poster Presentations, with the participation of undergraduate and graduate students, professors, researchers and entrepreneurs from Colombia, Russia, France, Venezuela, Brazil, Uruguay, Argentina, Peru, Mexico, United States, among others. Moreover, the objective of IMRMPT was to bring together national and international researchers in order to establish scientific cooperation in the field of materials science and plasma technology; introduce new techniques of surface treatment of materials to improve properties of metals in terms of the deterioration due to corrosion, hydrogen embrittlement, abrasion, hardness, among others; and establish cooperation agreements between universities and industry. The topics covered in the 2nd IMRMPT include New Materials, Surface Physics, Laser and Hybrid Processes, Characterization of Materials, Thin Films and Nanomaterials, Surface Hardening Processes, Wear and Corrosion / Oxidation, Modeling, Simulation and Diagnostics, Plasma Applications and Technologies, Biomedical Coatings and Surface Treatments, Non Destructive Evaluation and Online Process Control, Surface Modification (Ion Implantation, Ion Nitriding, PVD, CVD). The editors hope that those interested in the are of materials science and plasma technology, enjoy the reading that reflect a wide range of topics. It is a pleasure to thank the sponsors and all the participants and contributors for making possible this international meeting of researchers. It should be noted that the event organized by UIS and UPB universities, through their research groups FITEK and GINTEP, was a very significant contribution to the national and international scientific community, achieving the interaction of different research groups from academia and business sector. On behalf of the research groups GINTEP - UPB and FITEK - UIS, we greatly appreciate the support provided by the Sponsors, who allowed to continue with the dream of research. Ely Dannier V-Nitilde no The Editor The PDF file also contains a list of committees and sponsors.

Methyl siloxanes in environmental matrices and human plasma/fat from both general industries and residential areas in China.

PubMed

Xu, Lin; Shi, Yali; Liu, Nannan; Cai, Yaqi

2015-02-01

We investigated human exposure to methyl siloxanes in three general industries (building, automobile, and textile industries) and residential areas in China. Usage volumes of methyl siloxanes per capita in these industries were 2-5 orders of magnitudes higher than those in residential areas. Methyl siloxane concentrations in indoor air and dust samples from industrial facilities were 1-3 orders of magnitudes higher than those in residential houses. Both cyclic (D4-D6) and linear (L5-L16) siloxanes were detected in plasma of industrial workers (1.00-252 ng/mL, detection frequencies=3.7-71%, n=528), while only cyclic compounds (D4-D6) were detected in plasma of general population (n=519) with much lower concentrations (1.10-7.50 ng/mL) and detection frequencies (1.7-3.7%). During the occupational exposure, anti-dust mask can reduce 30% of intake of cyclic siloxanes and 74% of intake of linear siloxanes, respectively. In addition, PM-10 could elevate intake of linear siloxanes. Calculated fat-plasma partition ratios of methyl siloxanes (D4-D6, L6-L11) in the present study were 5.3-241 mL/g. Linear rather than cyclic siloxanes had an apparent accumulation in abdominal fat. Population's half-lives of L8-L10 in abdominal fat of general population were approximately 1.49-1.80 years. Copyright © 2014 Elsevier B.V. All rights reserved.

Influence of non-thermal plasma on structural and electrical properties of globular and nanostructured conductive polymer polypyrrole in water suspension.

PubMed

Galář, Pavel; Khun, Josef; Kopecký, Dušan; Scholtz, Vladimír; Trchová, Miroslava; Fučíková, Anna; Jirešová, Jana; Fišer, Ladislav

2017-11-08

Non-thermal plasma has proved its benefits in medicine, plasma assisted polymerization, food industry and many other fields. Even though, the ability of non-thermal plasma to modify surface properties of various materials is generally known, only limited attention has been given to exploitations of this treatment on conductive polymers. Here, we show study of non-thermal plasma treatment on properties of globular and nanostructured polypyrrole in the distilled water. We observe that plasma presence over the suspension level doesn't change morphology of the polymer (shape), but significantly influences its elemental composition and physical properties. After 60 min of treatment, the relative concentration of chloride counter ions decreased approximately 3 and 4 times for nanostructured and globular form, respectively and concentration of oxygen increased approximately 3 times for both forms. Simultaneously, conductivity decrease (14 times for globular and 2 times for nanostructured one) and changes in zeta potential characteristics of both samples were observed. The modification evolution was dominated by multi-exponential function with time constants having values approximately 1 and 10 min for both samples. It is expected that these time constants are related to two modification processes connected to direct presence of the spark and to long-lived species generated by the plasma.

IGIV: contents, properties, and methods of industrial production--evolving closer to a more physiologic product.

PubMed

Martin, Turf D

2006-04-01

Is the process the product? Immune globulin intravenous (IGIV) is not manufactured, but is purified (fractionated) from human plasma. Machines can only damage what Mother Nature makes; they cannot improve it. Therefore, fractionators of biologic molecules must strive to ensure what is taken from a human body is exactly the same when it is returned to the human body for optimal tolerability and safety. The processes of purification have the potential to adversely affect the product. Four primary purification processes exist for commercial IGIV. The Cohn-Oncley process is 1940s technology, which has been modified through the decades, but the basic process remains unchanged. The Kistler-Nitschmann process was developed in the 1950s by the Central Laboratory of the Swiss Red Cross (ZLB, today known as ZLB-Behring, a subsidiary of CSL Limited). Various attempts have been made to utilize chromatography as the sole separation technology without much success. Most recently, Bayer HealthCare (Talecris Biotherapeutics acquired the contributed assets of the worldwide plasma business of Bayer Biological Products and became operational April 1, 2005; all plasma-based products, including Gamunex, Prolastin, the hyperimmune line (Fraction II), Plasbumin (Bayer Albumin), Koate DVI, and Thrombate III were included) introduced a new product into the United States and Canada that utilizes caprylate and chromatography for high purity, better yields, and integration of safety and efficacy. This is the first new IGIV purification technology in over 20 years.

Investigation of the influence of pretreatment parameters on the surface characteristics of amorphous metal for use in power industry

NASA Astrophysics Data System (ADS)

Nieroda, Jolanta; Rybak, Andrzej; Kmita, Grzegorz; Sitarz, Maciej

2018-05-01

Metallic glasses are metallic materials, which exhibit an amorphous structure. These are mostly three or more component alloys, and some of them are magnetic metals. Materials of this kind are characterized by high electrical resistivity and at the same time exhibit very good magnetic properties (e.g. low-magnetization loss). The above mentioned properties are very useful in electrical engineering industry and this material is more and more popular as a substance for high-efficiency electrical devices production. This industry area is still evolving, and thus even higher efficiency of apparatus based on amorphous material is expected. A raw material must be carefully investigated and characterized before the main production process is started. Presented work contains results of complementary examination of amorphous metal Metglas 2605. Studies involve two ways to obtain clean and oxidized surface with high reactivity, namely degreasing followed by annealing process and plasma treatment. The amorphous metal parameters were examined by means of several techniques: surface free energy (SFE) measurements by sessile drop method, X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), and both ex situ and in situ Raman spectroscopy. Additionally, influence of plasma parameters on wetting properties were optimized in systematic way with Design of Experiments (DOE) method. A wide range of used methods allow to fully investigate the amorphous metal material during preliminary preparation of surface. Obtained results provide information about appropriate parameters that should be applied in order to obtain highly reactive surface with functional oxide layer on it.

Phosphorus-doped glass proton exchange membranes for low temperature direct methanol fuel cells

NASA Astrophysics Data System (ADS)

Prakash, Shruti; Mustain, William E.; Park, SeongHo; Kohl, Paul A.

Phosphorus-doped silicon dioxide thin films were used as ion exchange membranes in low temperature proton exchange membrane fuel cells. Phosphorus-doped silicon dioxide glass (PSG) was deposited via plasma-enhanced chemical vapor deposition (PECVD). The plasma deposition of PSG films allows for low temperature fabrication that is compatible with current microelectronic industrial processing. SiH 4, PH 3 and N 2O were used as the reactant gases. The effect of plasma deposition parameters, substrate temperature, RF power, and chamber pressure, on the ionic conductivity of the PSG films is elucidated. PSG conductivities as high as 2.54 × 10 -4 S cm -1 were realized, which is 250 times higher than the conductivity of pure SiO 2 films (1 × 10 -6 S cm -1) under identical deposition conditions. The higher conductivity films were deposited at low temperature, moderate pressure, limited reactant gas flow rate, and high RF power.

Simulating industrial plasma reactors - A fresh perspective

NASA Astrophysics Data System (ADS)

Mohr, Sebastian; Rahimi, Sara; Tennyson, Jonathan; Ansell, Oliver; Patel, Jash

2016-09-01

A key goal of the presented research project PowerBase is to produce new integration schemes which enable the manufacturability of 3D integrated power smart systems with high precision TSV etched features. The necessary high aspect ratio etch is performed via the BOSCH process. Investigations in industrial research are often use trial and improvement experimental methods. Simulations provide an alternative way to study the influence of external parameters on the final product, whilst also giving insights into the physical processes. This presentation investigates the process of simulating an industrial ICP reactor used over high power (up to 2x5 kW) and pressure (up to 200 mTorr) ranges, analysing the specific procedures to achieve a compromise between physical correctness and computational speed, while testing commonly made assumptions. This includes, for example, the effect of different physical models and the inclusion of different gas phase and surface reactions with the aim of accurately predicting the dependence of surface rates and profiles on external parameters in SF6 and C4F8 discharges. This project has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under Grant Agreement No. 662133 PowerBase.

Solid state recycling of aluminium alloys via a porthole die hot extrusion process: Scaling up to production

NASA Astrophysics Data System (ADS)

Paraskevas, Dimos; Kellens, Karel; Deng, Yelin; Dewulf, Wim; Kampen, Carlos; Duflou, Joost R.

2017-10-01

Whereas industrial symbiosis has led to increased energy and resource efficiency in process industries, this concept has not yet been applied in discrete product manufacturing. Metal scrap is first conventionally recycled, for which substantial energy and resource efficiency losses have been reported. Recent research has however proven the feasibility of `meltless' recycling of light metal scrap, yielding a first glimpse of potential industrial symbiosis. Various solid state recycling techniques (such as recycling via hot extrusion or Spark Plasma Sintering) have been proposed for scrap consolidation directly into bulk products or semis by physical disruption and dispersion of the oxide surface film by imposing significant plastic and shear strain. Solid State Recycling (SSR) methods can omit substantial material losses as they bypass the metallurgical recycling step. In this context the case of direct production of bulk aluminium profiles via hot extrusion at industrial scale is demonstrated within this paper. The extrusion tests were performed directly into the production line, highlighting the scaling up potentials and the industrial relevance of this research. A significant amount of machining chips were collected, chemically cleaned and cold compacted into chip based billets with ˜80% relative density. Afterwards the scrap consolidation was achieved by imposing significant plastic and shear deformation into the material during hot extrusion through a modified 2-porthole extrusion die-set. The production process sequence along with microstructural investigations and mechanical properties comparison of the cast based profile used as reference versus the chip based profile are presented.

Plasma Physics Applied (New Book)

NASA Astrophysics Data System (ADS)

Grabbe, Crockett

2007-03-01

0.5cm Plasma physics applications are one of the most rapidly growing fields in engineering & applied science today. The last decade alone has seen the rapid emergence of new applications such as dusty plasmas in the semiconductor and microchip industries, and plasma TVs. In addition, this last decade saw the achievement of the 50-year Lawson breakeven condition for fusion. With new discoveries in space plasma physics and applications to spacecraft for worldwide communication and space weather, as well as new applications being discovered, this diversity is always expanding. The new book Plasma Physics Applied reviews developments in several of these areas. Chapter 1 reviews the content and its authors, and is followed by a more comprehensive review of plasma physics applications in general in Chapter 2. Plasma applications in combustion and environmental uses are presented in Chapter 3. Lightning effects in planetary magnetospheres and potential application are described in Chapter 4. The area of dusty plasmas in both industrial and space plasmas and their applications are reviewed in Chapter 5. The particular area of Coulomb clusters in dusty plasmas is presented in Chapter 6. The variety of approaches to plasma confinement in magnetic devices for fusion are laid out in Chapter 7. Finally, an overview of plasma accelerator developments and their applications are presented in Chapter 8.

Deterioration to extinction of wastewater bacteria by non-thermal atmospheric pressure air plasma as assessed by 16S rDNA-DGGE fingerprinting

PubMed Central

El-Sayed, Wael S.; Ouf, Salama A.; Mohamed, Abdel-Aleam H.

2015-01-01

The use of cold plasma jets for inactivation of a variety of microorganisms has recently been evaluated via culture-based methods. Accordingly, elucidation of the role of cold plasma in decontamination would be inaccurate because most microbial populations within a system remain unexplored owing to the high amount of yet uncultured bacteria. The impact of cold atmospheric plasma on the bacterial community structure of wastewater from two different industries was investigated by metagenomic-based polymerase chain reaction-denaturing gradient gel electrophoresis (DGGE) utilizing 16S rRNA genes. Three doses of atmospheric pressure dielectric barrier discharge plasma were applied to wastewater samples on different time scales. DGGE revealed that the bacterial community gradually changed and overall abundance decreased to extinction upon plasma treatment. The bacterial community in food processing wastewater contained 11 key operational taxonomic units that remained almost completely unchanged when exposed to plasma irradiation at 75.5 mA for 30 or 60 s. However, when exposure time was extended to 90 s, only Escherichia coli, Coliforms, Aeromonas sp., Vibrio sp., and Pseudomonas putida survived. Only E. coli, Aeromonas sp., Vibrio sp., and P. putida survived treatment at 81.94 mA for 90 s. Conversely, all bacterial groups were completely eliminated by treatment at 85.34 mA for either 60 or 90 s. Dominant bacterial groups in leather processing wastewater also changed greatly upon exposure to plasma at 75.5 mA for 30 or 60 s, with Enterobacter aerogenes, Klebsiella sp., Pseudomonas stutzeri, and Acidithiobacillus ferrooxidans being sensitive to and eliminated from the community. At 90 s of exposure, all groups were affected except for Pseudomonas sp. and Citrobacter freundii. The same trend was observed for treatment at 81.94 mA. The variability in bacterial community response to different plasma treatment protocols revealed that plasma had a selective impact on bacterial community structure at lower doses and potential bactericidal effects at higher doses. PMID:26500637

The Ethics of Paid Plasma Donation: A Plea for Patient Centeredness.

PubMed

Farrugia, Albert; Penrod, Joshua; Bult, Jan M

2015-12-01

Plasma protein therapies (PPTs) are a group of essential medicines extracted from human plasma through processes of industrial scale fractionation. They are used primarily to treat a number of rare, chronic disorders ensuing from inherited or acquired deficiencies of a number of physiologically essential proteins. These disorders include hemophilia A and B, different immunodeficiencies and alpha 1-antitrypsin deficiency. In addition, acute blood loss, burns and sepsis are treated by PPTs. Hence, a population of vulnerable and very sick individuals is dependent on these products. In addition, the continued well-being of large sections of the community, including pregnant women and their children, travelers and workers exposed to infectious risk is also subject to the availability of these therapies. Their manufacture to adequate amounts requires large volumes of human plasma as the starting material of a complex purification process. Mainstream blood transfusion services run primarily by the not-for-profit sector have attempted to provide this plasma through the separation of blood donations, but have failed to provide sufficient amounts to meet the clinical demand. The collection of plasma from donors willing to commit to the process of plasmapheresis, which is not only time consuming but requires a long term, continuing commitment, generates much higher amounts of plasma and has been an activity historically separate from the blood transfusion sector and run by commercial companies. These companies now supply two-thirds of the growing global need for these therapies, while the mainstream government-run blood sector continues to supply a shrinking proportion. The private sector plasmapheresis activity which provides the bulk of treatment products has been compensating the donors in order to recognize the time and effort required. Recent activities have reignited the debate regarding the ethical and medical aspects of such compensation. In this work, we review the landscape; assess the contributions made by the compensated and non-compensated sectors and synthesize the outcomes on the relevant patient communities of perturbing the current paradigm of compensated plasma donation. We conclude that the current era of "Patient Centeredness" in health care demands the continuation and extension of paid plasma donation.

Parallel programming of industrial applications

DOE Office of Scientific and Technical Information (OSTI.GOV)

Heroux, M; Koniges, A; Simon, H

1998-07-21

In the introductory material, we overview the typical MPP environment for real application computing and the special tools available such as parallel debuggers and performance analyzers. Next, we draw from a series of real applications codes and discuss the specific challenges and problems that are encountered in parallelizing these individual applications. The application areas drawn from include biomedical sciences, materials processing and design, plasma and fluid dynamics, and others. We show how it was possible to get a particular application to run efficiently and what steps were necessary. Finally we end with a summary of the lessons learned from thesemore » applications and predictions for the future of industrial parallel computing. This tutorial is based on material from a forthcoming book entitled: "Industrial Strength Parallel Computing" to be published by Morgan Kaufmann Publishers (ISBN l-55860-54).« less

Optimization of Indium Bump Morphology for Improved Flip Chip Devices

NASA Technical Reports Server (NTRS)

Jones, Todd J.; Nikzad, Shouleh; Cunningham, Thomas J.; Blazejewski, Edward; Dickie, Matthew R.; Hoenk, Michael E.; Greer, Harold F.

2011-01-01

Flip-chip hybridization, also known as bump bonding, is a packaging technique for microelectronic devices that directly connects an active element or detector to a substrate readout face-to-face, eliminating the need for wire bonding. In order to make conductive links between the two parts, a solder material is used between the bond pads on each side. Solder bumps, composed of indium metal, are typically deposited by thermal evaporation onto the active regions of the device and substrate. While indium bump technology has been a part of the electronic interconnect process field for many years and has been extensively employed in the infrared imager industry, obtaining a reliable, high-yield process for high-density patterns of bumps can be quite difficult. Under the right conditions, a moderate hydrogen plasma exposure can raise the temperature of the indium bump to the point where it can flow. This flow can result in a desirable shape where indium will efficiently wet the metal contact pad to provide good electrical contact to the underlying readout or imager circuit. However, it is extremely important to carefully control this process as the intensity of the hydrogen plasma treatment dramatically affects the indium bump morphology. To ensure the fine-tuning of this reflow process, it is necessary to have realtime feedback on the status of the bumps. With an appropriately placed viewport in a plasma chamber, one can image a small field (a square of approximately 5 millimeters on each side) of the bumps (10-20 microns in size) during the hydrogen plasma reflow process. By monitoring the shape of the bumps in real time using a video camera mounted to a telescoping 12 magnifying zoom lens and associated optical elements, an engineer can precisely determine when the reflow of the bumps has occurred, and can shut off the plasma before evaporation or de-wetting takes place.

Development and evaluation of suspension plasma sprayed yttria stabilized zirconia coatings as thermal barriers

NASA Astrophysics Data System (ADS)

van Every, Kent J.

The insulating effects from thermal barrier coatings (TBCs) in gas turbine engines allow for increased operational efficiencies and longer service lifetimes. Consequently, improving TBCs can lead to enhanced gas turbine engine performance. This study was conducted to investigate if yttria-stabilized zirconia (YSZ) coatings, the standard industrial choice for TBCs, produced from nano-sized powder could provide better thermal insulation than current commericial YSZ coatings generated using micron-sized powders. The coatings for this research were made via the recently developed suspension plasma spraying (SPS) process. With SPS, powders are suspended in a solvent containing dispersing agents; the suspension is then injected directly into a plasma flow that evaporates the solvent and melts the powder while transporting it to the substrate. Although related to the industrial TBC production method of air plasma spraying (APS), SPS has two important differences---the ability to spray sub-micron diameter ceramic particles, and the ability to alloy the particles with chemicals dissolved in the solvent. These aspects of SPS were employed to generate a series of coatings from suspensions containing ˜100 nm diameter YSZ powder particles, some of which were alloyed with neodymium and ytterbium ions from the solvent. The SPS coatings contained columnar structures not observed in APS TBCs; thus, a theory was developed to explain the formation of these features. The thermal conductivity of the coatings was tested to evaluate the effects of these unique microstructures and the effects of the alloying process. The results for samples in the as-sprayed and heat-treated conditions were compared to conventional YSZ TBCs. This comparison showed that, relative to APS YSZ coatings, the unalloyed SPS samples typically exhibited higher as-sprayed and lower heat-treated thermal conductivities. All thermal conductivity values for the alloyed samples were lower than conventional YSZ TBCs. The different thermal conduction behaviors were linked to the porosity and compositional properties of the coatings using immersion density, SEM, and synchrotron radiation characterization techniques.

Development of High Power Vacuum Tubes for Accelerators and Plasma Heating

NASA Astrophysics Data System (ADS)

Srivastava, Vishnu

2012-11-01

High pulsed power magnetrons and klystrons for medical and industrial accelerators, and high CW power klystrons and gyrotrons for plasma heating in tokamak, are being developed at CEERI. S-band 2.0MW pulsed tunable magnetrons of centre frequency 2856MHz and 2998 MHz were developed, and S-band 2.6MW pulsed tunable magnetron is being developed for medical LINAC, and 3MW pulsed tunable magnetron is being developed for industrial accelerator. S-band (2856MHz), 5MW pulsed klystron was developed for particle accelerator, and S-band 6MW pulsed klystron is under development for 10MeV industrial accelerator. 350MHz, 100kW (CW) klystron is being developed for proton accelerator, and C-band 250kW (CW) klystron is being developed for plasma heating. 42GHz, 200kW (CW/Long pulse) gyrotron is under development for plasma heating. Plasma filled tubes are also being developed for switching. 25kV/1kA and 40kV/3kA thyratrons were developed for high voltage high current switching in pulse modulators for magnetrons and klystrons. 25kV/3kA Pseudospark switch of current rise time of 1kA/|a-sec and pulse repetition rate of 500Hz is being developed. Plasma assisted high power microwave device is also being investigated.

Rapid removal of bacterial endotoxin and natural organic matter in water by dielectric barrier discharge plasma: Efficiency and toxicity assessment.

PubMed

Zhang, Can; Fang, Zhendong; Liu, Wenjun; Tian, Fang; Bai, Miao

2016-11-15

Low-temperature plasma was used to control bacteria, endotoxins and natural organic matter (NOM) in water by a dielectric barrier discharge (DBD) device. Results indicate that DBD plasma has an obvious inactivation effect on various bacteria in water. The degree of inactivation from difficult to easy is as follows: Bacillus subtilis>Escherichia coli>Staphylococcus aureus. Activated ultrapure water treated using DBD plasma exhibited a sustained sterilization effect, but this sterilization effect decreased gradually after 1h. The total-endotoxin (free-endotoxin and bound-endotoxin) released by Escherichia coli during inactivation, as well as artificially simulated endotoxin in a control solution, was significantly controlled by DBD plasma. Both the metabolites that appeared after inactivation of microorganisms by plasma treatment, and the NOM in filtration effluent of a water treatment plant were well removed by DBD plasma if the treatment duration was sufficiently long. However, the acute toxicity increased significantly, and persisted for at least 2h, indicating that some long-life active substances were generated during the DBD process. Therefore, the removal of bacteria, endotoxins or NOM does not mean a safe water is produced. It is also important to eliminate the toxicity and byproducts produced during water treatment for the continuous promotion and industrial application of DBD plasma. Copyright © 2016 Elsevier B.V. All rights reserved.

In situ measurement of gas composition changes in radio frequency plasmas using a quartz sensor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Suzuki, Atsushi; Nonaka, Hidehiko

2009-09-15

A simple method using a quartz sensor (Q-sensor) was developed to observe gas composition changes in radio frequency (rf) plasmas. The output depends on the gases' absolute pressure, molecular weight, and viscosity. The pressure-normalized quartz sensor output depends only on the molecular weight and viscosity of the gas. Consequently, gas composition changes can be detected in the plasmas if a sensor can be used in the plasmas. Influences imparted by the plasmas on the sensor, such as those by reactive particles (e.g., radicals and ions), excited species, electrons, temperature, and electric potentials during measurements were investigated to test the applicabilitymore » of this quartz sensor measurement to plasma. The Q-sensor measurement results for rf plasmas with argon, hydrogen, and their mixtures are reproducible, demonstrating that the Q-sensor measurement is applicable for plasmas. In this work, pressure- and temperature-normalized Q-sensor output (NQO) were used to obtain the gas composition information of plasma. Temperature-normalization of the Q-sensor output enabled quartz sensor measurements near plasma electrodes, where the quartz sensor temperature increases. The changes in NQO agreed with results obtained by gas analysis using a quadrupole mass spectrometer. Results confirmed that the change in NQO is mainly attributable to changes in the densities and kinds of gas molecules in the plasma gas phase, not by other extrinsic influences of plasma. For argon, hydrogen, and argon-hydrogen plasmas, these changes correspond to reduction in nitrogen, production of carbon monoxide, and dissociation of hydrogen molecules, respectively. These changes in NQO qualitatively and somewhat quantitatively agreed with results obtained using gas analysis, indicting that the measurement has a potential application to obtain the gas composition in plasmas without disturbing industrial plasma processes.« less

Accelerated recovery of Atlantic salmon (Salmo salar) from effects of crowding by swimming.

PubMed

Veiseth, Eva; Fjaera, Svein Olav; Bjerkeng, Bjørn; Skjervold, Per Olav

2006-07-01

The effects of post-crowding swimming velocity (0, 0.35, and 0.70 m/s) and recovery time (1.5, 6, and 12 h) on physiological recovery and processing quality parameters of adult Atlantic salmon (Salmo salar) were determined. Atlantic salmon crowded to a density similar to that of a commercial slaughter process (>200 kg/m(3), 40 min) were transferred to a swimming chamber for recovery treatment. Osmolality and concentrations of cortisol, glucose and lactate in blood plasma were used as physiological stress indicators, whereas image analyses of extent and duration of rigor contraction, and fillet gaping were used as measures of processing quality. Crowded salmon had a 5.8-fold higher plasma cortisol concentration than control salmon (P<0.05). The elevated plasma cortisol concentration was reduced by increasing the swimming velocity, and had returned to control levels after 6 h recovery at high water velocity. Similar effects of swimming velocity were observed for plasma osmolality and lactate concentration. A lower plasma glucose concentration was present in crowded than in control fish (P<0.05), although a typical post-stress elevation in plasma glucose was observed after the recovery treatments. Lower muscle pH was found in crowded compared with control salmon (P<0.05), but muscle pH returned to control levels after 6 h recovery at intermediate and high swimming velocities and after 12 h in the low velocity group. Crowding caused an early onset of rigor mortis contraction. However, subjecting crowded salmon to active swimming for 6 h before slaughter delayed the onset of rigor mortis contraction from 2.5 to 7.5 h post mortem. The extent of rigor mortis contraction was also affected by crowding and post-stress swimming activity (P<0.05), and the largest degree of contraction was found in crowded salmon. In conclusion, active swimming accelerated the return of plasma cortisol, hydromineral balance, and the energy metabolism of adult Atlantic salmon to pre-stress levels. Moreover, an active swimming period delayed the onset of rigor mortis contraction, which has a positive technological implication for the salmon processing industry.

Effect of Bauxite addition on Adhesion Strength and Surface Roughness of Fly ash based Plasma Sprayed Coatings

NASA Astrophysics Data System (ADS)

Bhuyan, S. K.; Samal, S.; Pattnaik, D.; Sahu, A.; Swain, B.; Thiyagarajan, T. K.; Mishra, S. C.

2018-03-01

The environment is being contaminated with advancement of new technology, day by day. One of the primary sources for this contamination is the industrial waste. Industrialization is the prime reason behind the prosperity of any country to meet the materialistic demand. To run the industries, a huge amount of (electric) power is needed and hence need for thermal power plants to serve the purpose. In present scenario, coal fired thermal power plants are set up which generates a huge quantity of Fly ash. Consumption of industrial waste (Fly ash), continually a major concern for human race. In recent years, fly ash is being utilized for various purposes i.e. making bricks, mine reclamation, production of cements etc. The presence of Silica and Alumina in fly ash makes it useful for thermal barrier applications also. The plasma spray technology has the advantage of being able to process any types of metal/ceramic mineral, low-grade-ore minerals etc. to make value-added products and also to deposit ceramics, metals and a combination of these to deposit composite coatings with desired microstructure and required properties on a range of substrate materials. The present work focuses on utilization of fly ash mixing with bauxite (ore mineral) for a high valued application. Fly ash with 10 and 20% bauxite addition is used to deposit plasma spray overlay coatings at different power levels (10-20kW) on aluminum and mild steel substrates. Adhesion strength and surface roughness of the coatings are evaluated. Phase composition analysis of the coatings were done using X-ray diffraction analysis. Surface morphology of the coatings was studied using a scanning electron microscope (SEM). Maximum adhesion strength of 4.924 MPa is obtained for the composition fly ash and bauxite (10%), coated on mild steel at 16kW torch power level. The surface roughness (Ra) of the coatings is found to vary between 10.0102 to 17.2341 micron.

High Current Plasma Electrolytic Oxidation Coating Processes for Wear and Corrosion Prevention of Al 2024

NASA Astrophysics Data System (ADS)

Wang, Rui

Plasma electrolytic oxidation (PEO) treatments have been used in the aerospace and automotive industries because the coating formed on light metals or alloys has great hardness, high wear, corrosion, and oxidation resistance, and a low friction coefficient that improves lifetime length and provide a higher surface quality. However, the PEO treatments that are presently used for industrial applications require a long period of time to confirm the quality of the coating. For this reason, the present study seeks to increase the current density of PEO treatments to improve their efficiency and explore the performance of the obtained coatings. It was found that for high current density (0.18A/cm2) PEO treatments, smaller ratio, such as 50% and 70%, is beneficial to obtaining a better performance coating. When compared with the coating of a "normal" (current density: 0.09A/cm2) PEO treatment, it had better wear resistance; however, for corrosion resistance, it had a lower performance than the coatings obtained by the "normal" current density PEO treatment which was attributed to the negative influence of porosity increase.

Quantitative Characterization of Aqueous Byproducts from Hydrothermal Liquefaction of Municipal Wastes, Food Industry Wastes, and Biomass Grown on Waste

DOE Office of Scientific and Technical Information (OSTI.GOV)

Maddi, Balakrishna; Panisko, Ellen; Wietsma, Thomas

Hydrothermal liquefaction (HTL) is a viable thermochemical process for converting wet solid wastes into biocrude which can be hydroprocessed to liquid transportation fuel blendstocks and specialty chemicals. The aqueous byproduct from HTL contains significant amounts (20 to 50%) of the feed carbon, which must be used to enhance economic sustainability of the process on an industrial scale. In this study, aqueous fractions produced from HTL of industrial and municipal waste were characterized using a wide variety of analytical approaches. Organic chemical compounds present in these aqueous fractions were identified using two-dimensional gas chromatography equipped with time-of-flight mass spectrometry. Identified compoundsmore » include organic acids, nitrogen compounds, alcohols, aldehydes, and ketones. Conventional gas chromatography and liquid chromatography methods were employed to quantify the identified compounds. Inorganic species, in the aqueous stream of hydrothermal liquefaction of these aqueous byproducts, also were quantified using ion chromatography and inductively coupled plasma optical emission spectroscopy. The concentrations of organic chemical compounds and inorganic species are reported, and the significance of these results is discussed in detail.« less

Thermodynamics, transport phenomena, and electrochemistry of external field-assisted nonthermal food technologies.

PubMed

Misra, N N; Martynenko, Alex; Chemat, Farid; Paniwnyk, Larysa; Barba, Francisco J; Jambrak, Anet Režek

2018-07-24

Interest in the development and adoption of nonthermal technologies is burgeoning within the food and bioprocess industry, the associated research community, and among the consumers. This is evident from not only the success of some innovative nonthermal technologies at industrial scale, but also from the increasing number of publications dealing with these topics, a growing demand for foods processed by nonthermal technologies and use of natural ingredients. A notable feature of the nonthermal technologies such as cold plasma, electrohydrodynamic processing, pulsed electric fields, and ultrasound is the involvement of external fields, either electric or sound. Therefore, it merits to study the fundamentals of these technologies and the associated phenomenon with a unified approach. In this review, we revisit the fundamental physical and chemical phenomena governing the selected technologies, highlight similarities, and contrasts, describe few successful applications, and finally, identify the gaps in research.

Sustainability of a public system for plasma collection, contract fractionation and plasma-derived medicinal product manufacturing

PubMed Central

Grazzini, Giuliano; Ceccarelli, Anna; Calteri, Deanna; Catalano, Liviana; Calizzani, Gabriele; Cicchetti, Americo

2013-01-01

Background In Italy, the financial reimbursement for labile blood components exchanged between Regions is regulated by national tariffs defined in 1991 and updated in 1993–2003. Over the last five years, the need for establishing standard costs of healthcare services has arisen critically. In this perspective, the present study is aimed at defining both the costs of production of blood components and the related prices, as well as the prices of plasma-derived medicinal products obtained by national plasma, to be used for interregional financial reimbursement. Materials and methods In order to analyse the costs of production of blood components, 12 out 318 blood establishments were selected in 8 Italian Regions. For each step of the production process, driving costs were identified and production costs were. To define the costs of plasma-derived medicinal products obtained by national plasma, industrial costs currently sustained by National Health Service for contract fractionation were taken into account. Results The production costs of plasma-derived medicinal products obtained from national plasma showed a huge variability among blood establishments, which was much lower after standardization. The new suggested plasma tariffs were quite similar to those currently in force. Comparing the overall costs theoretically sustained by the National Health Service for plasma-derived medicinal products obtained from national plasma to current commercial costs, demonstrates that the national blood system could gain a 10% cost saving if it were able to produce plasma for fractionation within the standard costs defined in this study. Discussion Achieving national self-sufficiency through the production of plasma-derived medicinal products from national plasma, is a strategic goal of the National Health Service which must comply not only with quality, safety and availability requirements but also with the increasingly pressing need for economic sustainability. PMID:24333307

Sustainability of a public system for plasma collection, contract fractionation and plasma-derived medicinal product manufacturing.

PubMed

Grazzini, Giuliano; Ceccarelli, Anna; Calteri, Deanna; Catalano, Liviana; Calizzani, Gabriele; Cicchetti, Americo

2013-09-01

In Italy, the financial reimbursement for labile blood components exchanged between Regions is regulated by national tariffs defined in 1991 and updated in 1993-2003. Over the last five years, the need for establishing standard costs of healthcare services has arisen critically. In this perspective, the present study is aimed at defining both the costs of production of blood components and the related prices, as well as the prices of plasma-derived medicinal products obtained by national plasma, to be used for interregional financial reimbursement. In order to analyse the costs of production of blood components, 12 out 318 blood establishments were selected in 8 Italian Regions. For each step of the production process, driving costs were identified and production costs were. To define the costs of plasma-derived medicinal products obtained by national plasma, industrial costs currently sustained by National Health Service for contract fractionation were taken into account. The production costs of plasma-derived medicinal products obtained from national plasma showed a huge variability among blood establishments, which was much lower after standardization. The new suggested plasma tariffs were quite similar to those currently in force. Comparing the overall costs theoretically sustained by the National Health Service for plasma-derived medicinal products obtained from national plasma to current commercial costs, demonstrates that the national blood system could gain a 10% cost saving if it were able to produce plasma for fractionation within the standard costs defined in this study. Achieving national self-sufficiency through the production of plasma-derived medicinal products from national plasma, is a strategic goal of the National Health Service which must comply not only with quality, safety and availability requirements but also with the increasingly pressing need for economic sustainability.

Transition from edge-localized to center-localized power deposition in helicon discharges

NASA Astrophysics Data System (ADS)

Curreli, D.

2011-11-01

In radiofrequency (RF) helicon discharges the electromagnetic power is transferred from the RF field irradiated by the antenna to the plasma medium by means of plasma-wave coupling of the electromagnetic wave with the electrons. For the common industrial frequencies of tens of MHz, and for typical pressures of few Pascals, the power deposition occurs mostly at the edge of the discharge. In these conditions, ionization and electron heating occur in a layer close to the chamber walls, where a consistent fraction of the plasma is rapidly lost by diffusion toward the surface. The remaining fraction of plasma diffuses inward toward the center of the discharge, setting up a uniform and almost flat density profile, used in applications. A one-dimensional model considering both the plasma-wave coupling of the electrons with the RF wave and the macroscopic transport of ions and neutrals along the radial dimension of a cylindrical processing chamber has been derived and used to evaluate the profiles at equilibrium. The model has been validated through Langmuir probe measurements in helicon processing chambers. The numerical model has then been used to study the power-coupling behavior of the discharge when the pressure of the neutral gas is decreased. When the Knudsen number of the neutral gas approaches unity and in conditions of slightly magnetized discharge, the power deposition shifts from being edge-localized to center-localized, thus reducing the particle fluxes toward the walls and increasing the efficiency of the coupling.

Detection of Chamber Conditioning Through Optical Emission and Impedance Measurements

NASA Technical Reports Server (NTRS)

Cruden, Brett A.; Rao, M. V. V. S.; Sharma, Surendra P.; Meyyappan, Meyya

2001-01-01

During oxide etch processes, buildup of fluorocarbon residues on reactor sidewalls can cause run-to-run drift and will necessitate some time for conditioning and seasoning of the reactor. Though diagnostics can be applied to study and understand these phenomena, many of them are not practical for use in an industrial reactor. For instance, measurements of ion fluxes and energy by mass spectrometry show that the buildup of insulating fluorocarbon films on the reactor surface will cause a shift in both ion energy and current in an argon plasma. However, such a device cannot be easily integrated into a processing system. The shift in ion energy and flux will be accompanied by an increase in the capacitance of the plasma sheath. The shift in sheath capacitance can be easily measured by a common commercially available impedance probe placed on the inductive coil. A buildup of film on the chamber wall is expected to affect the production of fluorocarbon radicals, and thus the presence of such species in the optical emission spectrum of the plasma can be monitored as well. These two techniques are employed on a GEC (Gaseous Electronics Conference) Reference Cell to assess the validity of optical emission and impedance monitoring as a metric of chamber conditioning. These techniques are applied to experimental runs with CHF3 and CHF3/O2/Ar plasmas, with intermediate monitoring of pure argon plasmas as a reference case for chamber conditions.

Amine Enrichment of Thin-Film Composite Membranes via Low Pressure Plasma Polymerization for Antimicrobial Adhesion.

PubMed

Reis, Rackel; Dumée, Ludovic F; He, Li; She, Fenghua; Orbell, John D; Winther-Jensen, Bjorn; Duke, Mikel C

2015-07-15

Thin-film composite membranes, primarily based on poly(amide) (PA) semipermeable materials, are nowadays the dominant technology used in pressure driven water desalination systems. Despite offering superior water permeation and salt selectivity, their surface properties, such as their charge and roughness, cannot be extensively tuned due to the intrinsic fabrication process of the membranes by interfacial polymerization. The alteration of these properties would lead to a better control of the materials surface zeta potential, which is critical to finely tune selectivity and enhance the membrane materials stability when exposed to complex industrial waste streams. Low pressure plasma was employed to introduce amine functionalities onto the PA surface of commercially available thin-film composite (TFC) membranes. Morphological changes after plasma polymerization were analyzed by SEM and AFM, and average surface roughness decreased by 29%. Amine enrichment provided isoelectric point changes from pH 3.7 to 5.2 for 5 to 15 min of plasma polymerization time. Synchrotron FTIR mappings of the amine-modified surface indicated the addition of a discrete 60 nm film to the PA layer. Furthermore, metal affinity was confirmed by the enhanced binding of silver to the modified surface, supported by an increased antimicrobial functionality with demonstrable elimination of E. coli growth. Essential salt rejection was shown minimally compromised for faster polymerization processes. Plasma polymerization is therefore a viable route to producing functional amine enriched thin-film composite PA membrane surfaces.

Laser-driven electron beam and radiation sources for basic, medical and industrial sciences.

PubMed

Nakajima, Kazuhisa

2015-01-01

To date active research on laser-driven plasma-based accelerators have achieved great progress on production of high-energy, high-quality electron and photon beams in a compact scale. Such laser plasma accelerators have been envisaged bringing a wide range of applications in basic, medical and industrial sciences. Here inheriting the groundbreaker's review article on "Laser Acceleration and its future" [Toshiki Tajima, (2010)],(1)) we would like to review recent progress of producing such electron beams due to relativistic laser-plasma interactions followed by laser wakefield acceleration and lead to the scaling formulas that are useful to design laser plasma accelerators with controllability of beam energy and charge. Lastly specific examples of such laser-driven electron/photon beam sources are illustrated.

Inactivation of Escherichia coli and Staphylococcus aureus on contaminated perilla leaves by Dielectric Barrier Discharge (DBD) plasma treatment.

PubMed

Ji, Sang Hye; Ki, Se Hoon; Ahn, Ji Ho; Shin, Jae Ho; Hong, Eun Jeong; Kim, Yun Ji; Choi, Eun Ha

2018-04-02

This study focused on sterilization methods for the reduction of microorganisms on perilla leaves by cylinder type Dielectric Barrier Discharge (DBD) plasma with underwater bubbler treatment. S. aureus and E. coli in a suspension were reduced to less than 3.4 and 0.5 log CFU/ml after the plasma treatment for 3 min, respectively. On the perilla leaves, they were also reduced to 4.8 and 1.6 log CFU/ml after the plasma treatment, respectively. The S. aureus and E. coli bacterial cell wall was damaged by the plasma treatment evident by scanning electron microscopic analysis. The observed infrared bands of the FTIR spectra demonstrated changes in protein, lipid, polysaccharide, polyphosphate group and other carbohydrate functionalities of plasma treated bacteria and untreated bacterial cell membranes. The degradation of the constituent bonds of the bacterial cell membrane by RONS generated from plasma destroys the DNA, RNA, and proteins within the cell, and may eventually cause cell death. In this study, H 2 O 2 (13.68 μM) and NO 3 (138 μM), which are the main factors generated by plasma, proved to have a bactericidal effect by inducing lipid peroxidation of bacterial cell membranes. In conclusion, cylinder type DBD plasma with underwater bubbler can be used as an environmentally friendly food disinfection device in cleaning processes of the food industry. Copyright © 2018 Elsevier Inc. All rights reserved.

Langmuir Probe Measurements in an Inductively Coupled Ar/CF4 Plasmas

NASA Technical Reports Server (NTRS)

Rao, M. V. V. S.; Meyyappan, M.; Sharma, S. P.; Arnold, James O. (Technical Monitor)

2000-01-01

Technological advancement in the microelectronics industry requires an understanding of the physical and chemical processes occurring in plasmas of fluorocarbon gases, such as carbon tetrafluoride (CF4) which is commonly used as an etchant, and their mixtures to optimize various operating parameters. In this paper we report data on electron number density (ne), electron temperature'(Te), electron energy distribution function (EEDF), mean electron energy, ion number density (ni), and plasma potential (Vp) measured by using Langmuir probe in an inductively coupled 13.56 MHz radio frequency plasmas generated in 50%Ar:50%CF4 mixture in the GEC cell. The probe data were recorded at various radial positions providing radial profiles of these plasma parameters at 10-50 mTorr pressures and 200 W and 300 W of RF power. Present measurements indicate that the electron and ion number densities increase with increase in pressure and power. Whereas the plasma potential and electron temperature decrease with increase in pressure, and they weakly depend on RF power. The radial profiles exhibit that the electron and ion number densities and the plasma potential peak at the center of the plasma with an exponential fall away from it, while the electron temperature has a minimum at the center and it increases steadily towards the electrode edge. The EEDFs have a characteristic drop near the low energy end at all pressures and pressures and their shapes represent non-Maxwellian plasma and exhibit more like Druyvesteyn energy distribution.v

Using atmospheric plasma to increase wettability, imbibition and germination of physically dormant seeds of Mimosa Caesalpiniafolia.

PubMed

da Silva, A R M; Farias, M L; da Silva, D L S; Vitoriano, J O; de Sousa, R C; Alves-Junior, C

2017-09-01

In this study, we analyzed seed wettability as well as imbibition and germination after treatment with atmospheric pressure cold plasma (APCP) using dielectric barrier discharge (DBD) in seeds that have very low germination rates. To aid industrial applications, several seeds were simultaneously treated with plasma within a space between two coaxial glass tubes sandwiched by two metal mesh screens that produced high-voltage pulses at 17.5kV with a frequency of 990Hz. Three treatment times (3min, 9min and 15min) as well as untreated seeds were used to conduct the wettability, imbibition and germination tests. The wettability and imbibition were found to be directly related to the treatment duration, but saturation of the imbibition was found for treatment durations greater than 9min. Plasma treatment was also effective in improving germination, but shorter treatment duration presented greater germination. This apparent contradiction is explained by the cell damage caused by the increased exposure to plasma, as observed in other studies. The results suggest that there must be an optimal wettability and imbibition condition that ensures that excessive moisture does not harm the germination process. Copyright © 2017 Elsevier B.V. All rights reserved.

Unbiased roughness measurements: the key to better etch performance

NASA Astrophysics Data System (ADS)

Liang, Andrew; Mack, Chris; Sirard, Stephen; Liang, Chen-wei; Yang, Liu; Jiang, Justin; Shamma, Nader; Wise, Rich; Yu, Jengyi; Hymes, Diane

2018-03-01

Edge placement error (EPE) has become an increasingly critical metric to enable Moore's Law scaling. Stochastic variations, as characterized for lines by line width roughness (LWR) and line edge roughness (LER), are dominant factors in EPE and known to increase with the introduction of EUV lithography. However, despite recommendations from ITRS, NIST, and SEMI standards, the industry has not agreed upon a methodology to quantify these properties. Thus, differing methodologies applied to the same image often result in different roughness measurements and conclusions. To standardize LWR and LER measurements, Fractilia has developed an unbiased measurement that uses a raw unfiltered line scan to subtract out image noise and distortions. By using Fractilia's inverse linescan model (FILM) to guide development, we will highlight the key influences of roughness metrology on plasma-based resist smoothing processes. Test wafers were deposited to represent a 5 nm node EUV logic stack. The patterning stack consists of a core Si target layer with spin-on carbon (SOC) as the hardmask and spin-on glass (SOG) as the cap. Next, these wafers were exposed through an ASML NXE 3350B EUV scanner with an advanced chemically amplified resist (CAR). Afterwards, these wafers were etched through a variety of plasma-based resist smoothing techniques using a Lam Kiyo conductor etch system. Dense line and space patterns on the etched samples were imaged through advanced Hitachi CDSEMs and the LER and LWR were measured through both Fractilia and an industry standard roughness measurement software. By employing Fractilia to guide plasma-based etch development, we demonstrate that Fractilia produces accurate roughness measurements on resist in contrast to an industry standard measurement software. These results highlight the importance of subtracting out SEM image noise to obtain quicker developmental cycle times and lower target layer roughness.

Effect of Cut Quality on Hybrid Laser Arc Welding of Thick Section Steels

NASA Astrophysics Data System (ADS)

Farrokhi, F.; Nielsen, S. E.; Schmidt, R. H.; Pedersen, S. S.; Kristiansen, M.

From an industrial point of view, in a laser cutting-welding production chain, it is of great importance to know the influence of the attainable laser cut quality on the subsequent hybrid laser arc welding process. Many studies have been carried out in the literature to obtain lower surface roughness values on the laser cut edge. However, in practice, the cost and reliability of the cutting process is crucial and it does not always comply with obtaining the highest surface quality. In this study, a number of experiments on 25 mm steel plates were carried out to evaluate the influence of cut surface quality on the final quality of the subsequent hybrid laser welded joints. The different cut surfaces were obtained by different industrial cutting methods including laser cutting, abrasive water cutting, plasma cutting, and milling. It was found that the mentioned cutting methods could be used as preparation processes for the subsequent hybrid laser arc welding. However, cut quality could determine the choice of process parameters of the following hybrid laser arc welding.

Plasma vitrification of asbestos fibers

DOE Office of Scientific and Technical Information (OSTI.GOV)

Camacho, S.L.

Asbestos is a mineral in the form of long, thread-like fibers. Asbestos fibers have been among the best insulators of pipes, boilers, ducts, tanks, etc., in buildings, ships, and industrial furnaces. Over 150,000 metric tons of asbestos were consumed in the United States in 1984. The Environmental Protection Agency has declared asbestos fibers a known human carcinogen. And today, asbestos insulators are being replaced by manmade non-hazardous fibers. Millions of tons of replaced asbestos fiber insulators are in storage, awaiting the demonstration of effective alternative disposal technologies. Plasma vitrification has been demonstrated during May, June and July 1995 as amore » viable, cost-effective, safe technology for asbestos fiber disposal. A low-mass plasma arc heater is submerged under the waste asbestos insulating materials, and the intense heat of the plasma flame heats and melts the fibers. The by-product is dark, non-hazardous glass pellets. The vitrification process renders the asbestos waste safe for use as road construction aggregates or other fill materials. This paper will describe the results of start-up of a 1 ton-per-hour Plasma Mobile Asbestos Vitrification (MAV) Plant at a DOD Site in Port Clinton, Ohio. The Plasma MAV Plant is being demonstrated for the on-site disposal of 1.5 million pounds of Amosite asbestos fibers.« less

Effect of low-pressure plasma treatment on the color and oxidative stability of raw pork during refrigerated storage.

PubMed

Ulbin-Figlewicz, Natalia; Jarmoluk, Andrzej

2016-06-01

The effect of low-pressure plasma on quality attributes of meat is an important aspect, which must be considered before application in food. The aim of this study was to determine the color, fatty acid composition, lipid oxidation expressed as thiobarbituric acid reactive substances and total antioxidant capacity of raw pork samples exposed to helium low-pressure plasma treatment (20 kPa) for 0, 2, 5, and 10 min during the storage period. The thiobarbituric acid reactive substance concentrations of all plasma-treated samples during storage were in the range from 0.26 to 0.61 mg malondialdehyde/kg. Exposure time caused significant changes only in total color difference, hue angle, and chroma after 10 min of treatment. Ferric reducing ability of plasma values of meat samples decreased from 1.93 to 1.40 mmol Trolox Eq/kg after 14 days of storage. The storage period significantly affected proportion of polyunsaturated fatty acids, with an increase about 3% after 14 days of refrigeration storage while the content of saturated fatty acids was at the same level. Helium low-pressure plasma does not induce oxidative processes. Application of this decontamination technique while maintaining product quality is possible in food industry. © The Author(s) 2015.

Microwave Assisted Helicon Plasmas

NASA Astrophysics Data System (ADS)

McKee, John; Caron, David; Jemiolo, Andrew; Scime, Earl

2017-10-01

The use of two (or more) rf sources at different frequencies is a common technique in the plasma processing industry to control ion energy characteristics separately from plasma generation. A similar approach is presented here with the focus on modifying the electron population in argon and helium plasmas. The plasma is generated by a helicon source at a frequency f0 = 13.56 MHz. Microwaves of frequency f1 = 2.45 GHz are then injected into the helicon source chamber perpendicular to the background magnetic field. The microwaves damp on the electrons via X-mode Electron Cyclotron Heating (ECH) at the upper hybrid resonance, providing additional energy input into the electrons. The effects of this secondary-source heating on electron density, temperature, and energy distribution function are examined and compared to helicon-only single source plasmas as well as numeric models suggesting that the heating is not evenly distributed. Optical Emission Spectroscopy (OES) is used to examine the impact of the energetic tail of the electron distribution on ion and neutral species via collisional excitation. Large enhancements of neutral spectral lines are observed in both Ar and He. While small enhancement of ion lines is seen in Ar, ion lines not normally present in He are observed during microwave injection. U.S. National Science Foundation Grant No. PHY-1360278.

Rôle de l'hydrogène dans le procédé de purification du silicium par plasma thermique inductif

NASA Astrophysics Data System (ADS)

Erin, J.; Morvan, D.; Amouroux, J.

1993-03-01

The use of the thermal process for purification of silicon led to a material with the chemical purity required for phototovoltaic applications. In this paper, the various properties of ArH2 plasma mixtures are briefly reviewed and the effect of hydrogen percentage in an argon plasma used for melting and purifying silicon is pointed out. Physico-chemical analysis of the purified silicon showed that hydrogen diffused in the material and could passivate crystal defects by formation of stable chemical bonds such as Si-H. La technique de purification du silicium sous plasma thermique permet d'aboutir à un matériau de pureté chimique requise pour l'industrie photovoltaïque. Dans ce travail, nous soulignerons le rôle de l'hydrogène intervenant dans les propriétés du plasma en rappelant les caractéristiques des plasmas Ar-H2 utilisés pour fondre et purifier le silicium. Les caractéristiques physico-chimiques du silicium purifié montrent que l'hydrogène diffuse dans le matériau et est en mesure de cicatriser les défauts cristallins par formation de liaisons chimiques stables de type Si-H.

High-efficiency removal of NOx using dielectric barrier discharge nonthermal plasma with water as an outer electrode

NASA Astrophysics Data System (ADS)

Dan, ZHAO; Feng, YU; Amin, ZHOU; Cunhua, MA; Bin, DAI

2018-01-01

With the rapid increase in the number of cars and the development of industry, nitrogen oxide (NOx) emissions have become a serious and pressing problem. This work reports on the development of a water-cooled dielectric barrier discharge reactor for gaseous NOx removal at low temperature. The characteristics of the reactor are evaluated with and without packing of the reaction tube with 2 mm diameter dielectric beads composed of glass, ZnO, MnO2, ZrO2, or Fe2O3. It is found that the use of a water-cooled tube reduces the temperature, which stabilizes the reaction, and provides a much greater NO conversion efficiency (28.8%) than that obtained using quartz tube (14.1%) at a frequency of 8 kHz with an input voltage of 6.8 kV. Furthermore, under equivalent conditions, packing the reactor tube with glass beads greatly increases the NO conversion efficiency to 95.85%. This is because the dielectric beads alter the distribution of the electric field due to the influence of polarization at the glass bead surfaces, which ultimately enhances the plasma discharge intensity. The presence of the dielectric beads increases the gas residence time within the reactor. Experimental verification and a theoretical basis are provided for the industrial application of the proposed plasma NO removal process employing dielectric bead packing.

Atmospheric pressure cold plasma treatment of cellulose based fillers for wood plastic composites

NASA Astrophysics Data System (ADS)

Lekobou, William; Englund, Karl; Pedrow, Patrick; Scudiero, Louis

2011-10-01

The main challenge of wood plastic composites (WPC) resides in the low interfacial adhesion due to incompatibility between the cellulose based filler that has a polar surface and most common matrixes, polyolefins which are non-polar. Plasma treatment is a promising technique for surface modification and its implementation into the processing of WPC would provide this industry with a versatile and nearly environmentally benign manufacturing tool. Our investigation aims at designing a cold atmospheric pressure plasma reactor for coating fillers with a hydrophobic material prior to compounding with the matrix. Deposition was achieved with our reactor that includes an array of high voltage needles, a grounded metal mesh, Ar as carrier gas and C2H2 as the precursor molecule. Parameters studied have included gas feed rates and applied voltage; FTIR, ESCA, AFM and SEM imaging were used for film diagnostics. We will also report on deposition rate and its dependence on radial and axial position as well as the effects of plasma-polymerized acetylene on the surface free energy of cellulose based substrates.

Oxidation Behavior of Titanium Carbonitride Coating Deposited by Atmospheric Plasma Spray Synthesis

NASA Astrophysics Data System (ADS)

Zhu, Lin; He, Jining; Yan, Dianran; Liao, Hanlin; Zhang, Nannan

2017-10-01

As a high-hardness and anti-frictional material, titanium carbonitride (TiCN) thick coatings or thin films are increasingly being used in many industrial fields. In the present study, TiCN coatings were obtained by atmospheric plasma spray synthesis or reactive plasma spray. In order to promote the reaction between the Ti particles and reactive gases, a home-made gas tunnel was mounted on a conventional plasma gun to perform the spray process. The oxidation behavior of the TiCN coatings under different temperatures in static air was carefully investigated. As a result, when the temperature was over 700 °C, the coatings suffered from serious oxidation, and finally they were entirely oxidized to the TiO2 phase at 1100 °C. The principal oxidation mechanism was clarified, indicating that the oxygen can permeate into the defects and react with TiCN at high temperatures. In addition, concerning the use of a TiCN coating in high-temperature conditions, the microhardness of the oxidized coatings at different treatment temperatures was also evaluated.

Solution-Processed Cu2Se Nanocrystal Films with Bulk-Like Thermoelectric Performance.

PubMed

Forster, Jason D; Lynch, Jared J; Coates, Nelson E; Liu, Jun; Jang, Hyejin; Zaia, Edmond; Gordon, Madeleine P; Szybowski, Maxime; Sahu, Ayaskanta; Cahill, David G; Urban, Jeffrey J

2017-06-05

Thermoelectric power generation can play a key role in a sustainable energy future by converting waste heat from power plants and other industrial processes into usable electrical power. Current thermoelectric devices, however, require energy intensive manufacturing processes such as alloying and spark plasma sintering. Here, we describe the fabrication of a p-type thermoelectric material, copper selenide (Cu 2 Se), utilizing solution-processing and thermal annealing to produce a thin film that achieves a figure of merit, ZT, which is as high as its traditionally processed counterpart, a value of 0.14 at room temperature. This is the first report of a fully solution-processed nanomaterial achieving performance equivalent to its bulk form and represents a general strategy to reduce the energy required to manufacture advanced energy conversion and harvesting materials.

Removal of Tin from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma

NASA Astrophysics Data System (ADS)

Elg, Daniel Tyler

Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore's Law and continuously shrank device feature sizes, the wavelength of the lithography source remained at or below the resolution limit of the minimum feature size. Since 2001, however, the light source has been the 193nm ArF excimer laser. While the industry has managed to keep up with Moore's Law, shrinking feature sizes without shrinking the lithographic wavelength has required extra innovations and steps that increase fabrication time, cost, and error. These innovations include immersion lithography and double patterning. Currently, the industry is at the 14 nm technology node. Thus, the minimum feature size is an order of magnitude below the exposure wavelength. For the 10 nm node, triple and quadruple patterning have been proposed, causing potentially even more cost, fabrication time, and error. Such a trend cannot continue indefinitely in an economic fashion, and it is desirable to decrease the wavelength of the lithography sources. Thus, much research has been invested in extreme ultraviolet lithography (EUVL), which uses 13.5 nm light. While much progress has been made in recent years, some challenges must still be solved in order to yield a throughput high enough for EUVL to be commercially viable for high-volume manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma (LPP) and ionizing the Sn to (on average) the +10 state. Additionally, no materials are known to easily transmit EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel Sn ions and neutrals, which degrade the quality of collector optics. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris. Debris mitigation methods have largely managed to reduce this problem by using collisions with H2 buffer gas to slow down the energetic ions. However, deposition can take place at all ion and neutral energies, and no mitigation method can deterministically deflect all neutrals away from the collector. Thus, deposition still takes place, lowering the collector reflectivity and increasing the time needed to deliver enough EUV power to pattern a wafer. Additionally, even once EUV reaches HVM insertion, source power will need to be continually increased as feature sizes continue to shrink; this increase in source power may potentially come at a cost of increased debris. Thus, debris mitigation solutions that work for the initial generation of commercial EUVL systems may not be adequate for future generations. An in-situ technology to clean collector optics without source downtime is required. which will require an in-situ technology to clean collector optics. The novel cleaning solution described in this work is to create the radicals directly on the collector surface by using the collector itself to drive a capacitively-coupled hydrogen plasma. This allows for radical creation at the desired location without requiring any delivery system and without requiring any source downtime. Additionally, the plasma provides energetic radicals that aid in the etching process. This work will focus on two areas. First, it will focus on experimental collector cleaning and EUV reflectivity restoration. Second, it will focus on developing an understanding of the fundamental processes governing Sn removal. It will be shown that this plasma technique can clean an entire collector optic and restore EUV reflectivity to MLMs without damaging them. Additionally, it will be shown that, within the parameter space explored, the limiting factor in Sn etching is not hydrogen radical flux or SnH4 decomposition but ion energy flux. This will be backed up by experimental measurements, as well as a plasma chemistry model of the radical density and a 3D model of SnH4 transport and redeposition.

Analytic Hierarchy and Economic Analysis of a Plasma Gasification System for Naval Air Station Oceana-Dam Neck

DTIC Science & Technology

2014-08-30

asbestos containing material, pathological wastes, contaminated soils, glass waste, hazardous fly ash, solvents, ceramic waste, incinerator ash, paints...industrial waste into synthetic gas (Syn-Gas) and slag . For this study, the focus will be on the disposal of municipal solid waste. However, there is...Chemical Reactor The two primary by-products resulting from the gasification process are molten slag , which is collected through a portal at the base

The role of plasma chemistry on functional silicon nitride film properties deposited at low-temperature by mixing two frequency powers using PECVD.

PubMed

Sahu, B B; Yin, Y Y; Tsutsumi, T; Hori, M; Han, Jeon G

2016-05-14

Control of the plasma densities and energies of the principal plasma species is crucial to induce modification of the plasma reactivity, chemistry, and film properties. This work presents a systematic and integrated approach to the low-temperature deposition of hydrogenated amorphous silicon nitride films looking into optimization and control of the plasma processes. Radiofrequency (RF) and ultrahigh frequency (UHF) power are combined to enhance significantly the nitrogen plasma and atomic-radical density to enforce their effect on film properties. This study presents an extensive investigation of the influence of combining radiofrequency (RF) and ultrahigh frequency (UHF) power as a power ratio (PR = RF : UHF), ranging from 4 : 0 to 0 : 4, on the compositional, structural, and optical properties of the synthesized films. The data reveal that DF power with a characteristic bi-Maxwellian electron energy distribution function (EEDF) is effectively useful for enhancing the ionization and dissociation of neutrals, which in turn helps in enabling high rate deposition with better film properties than that of SF operations. Utilizing DF PECVD, a wide-bandgap of ∼3.5 eV with strong photoluminescence features can be achieved only by using a high-density plasma and high nitrogen atom density at room temperature. The present work also proposes the suitability of the DF PECVD approach for industrial applications.

Advanced ceramic materials for next-generation nuclear applications

NASA Astrophysics Data System (ADS)

Marra, John

2011-10-01

The nuclear industry is at the eye of a 'perfect storm' with fuel oil and natural gas prices near record highs, worldwide energy demands increasing at an alarming rate, and increased concerns about greenhouse gas (GHG) emissions that have caused many to look negatively at long-term use of fossil fuels. This convergence of factors has led to a growing interest in revitalization of the nuclear power industry within the United States and across the globe. Many are surprised to learn that nuclear power provides approximately 20% of the electrical power in the US and approximately 16% of the world-wide electric power. With the above factors in mind, world-wide over 130 new reactor projects are being considered with approximately 25 new permit applications in the US. Materials have long played a very important role in the nuclear industry with applications throughout the entire fuel cycle; from fuel fabrication to waste stabilization. As the international community begins to look at advanced reactor systems and fuel cycles that minimize waste and increase proliferation resistance, materials will play an even larger role. Many of the advanced reactor concepts being evaluated operate at high-temperature requiring the use of durable, heat-resistant materials. Advanced metallic and ceramic fuels are being investigated for a variety of Generation IV reactor concepts. These include the traditional TRISO-coated particles, advanced alloy fuels for 'deep-burn' applications, as well as advanced inert-matrix fuels. In order to minimize wastes and legacy materials, a number of fuel reprocessing operations are being investigated. Advanced materials continue to provide a vital contribution in 'closing the fuel cycle' by stabilization of associated low-level and high-level wastes in highly durable cements, ceramics, and glasses. Beyond this fission energy application, fusion energy will demand advanced materials capable of withstanding the extreme environments of high-temperature plasma systems. Fusion reactors will likely depend on lithium-based ceramics to produce tritium that fuels the fusion plasma, while high-temperature alloys or ceramics will contain and control the hot plasma. All the while, alloys, ceramics, and ceramic-related processes continue to find applications in the management of wastes and byproducts produced by these processes.

Development and Validation of an Inductively Coupled Plasma Mass Spectrometry (ICP-MS) Method for Quantitative Analysis of Platinum in Plasma, Urine, and Tissues.

PubMed

Zhang, Ti; Cai, Shuang; Forrest, Wai Chee; Mohr, Eva; Yang, Qiuhong; Forrest, M Laird

2016-09-01

Cisplatin, a platinum chemotherapeutic, is one of the most commonly used chemotherapeutic agents for many solid tumors. In this work, we developed and validated an inductively coupled plasma mass spectrometry (ICP-MS) method for quantitative determination of platinum levels in rat urine, plasma, and tissue matrices including liver, brain, lungs, kidney, muscle, heart, spleen, bladder, and lymph nodes. The tissues were processed using a microwave accelerated reaction system (MARS) system prior to analysis on an Agilent 7500 ICP-MS. According to the Food and Drug Administration guidance for industry, bioanalytical validation parameters of the method, such as selectivity, accuracy, precision, recovery, and stability were evaluated in rat biological samples. Our data suggested that the method was selective for platinum without interferences caused by other presenting elements, and the lower limit of quantification was 0.5 ppb. The accuracy and precision of the method were within 15% variation and the recoveries of platinum for all tissue matrices examined were determined to be 85-115% of the theoretical values. The stability of the platinum-containing solutions, including calibration standards, stock solutions, and processed samples in rat biological matrices was investigated. Results indicated that the samples were stable after three cycles of freeze-thaw and for up to three months. © The Author(s) 2016.

Development and Validation of an Inductively Coupled Plasma Mass Spectrometry (ICP-MS) Method for Quantitative Analysis of Platinum in Plasma, Urine, and Tissues

PubMed Central

Zhang, Ti; Cai, Shuang; Forrest, Wai Chee; Mohr, Eva; Yang, Qiuhong; Forrest, M. Laird

2016-01-01

Cisplatin, a platinum chemotherapeutic, is one of the most commonly used chemotherapeutic agents for many solid tumors. In this work, we developed and validated an inductively coupled plasma mass spectrometry (ICP-MS) method for quantitative determination of platinum levels in rat urine, plasma, and tissue matrices including liver, brain, lungs, kidney, muscle, heart, spleen, bladder, and lymph nodes. The tissues were processed using a microwave accelerated reaction system (MARS) system prior to analysis on an Agilent 7500 ICP-MS. According to the Food and Drug Administration guidance for industry, bioanalytical validation parameters of the method, such as selectivity, accuracy, precision, recovery, and stability were evaluated in rat biological samples. Our data suggested that the method was selective for platinum without interferences caused by other presenting elements, and the lower limit of quantification was 0.5 ppb. The accuracy and precision of the method were within 15% variation and the recoveries of platinum for all tissue matrices examined were determined to be 85–115% of the theoretical values. The stability of the platinum-containing solutions, including calibration standards, stock solutions, and processed samples in rat biological matrices was investigated. Results indicated that the samples were stable after three cycles of freeze–thaw and for up to three months. PMID:27527103

Determining the Concentrations and Temperatures of Products in a CF_4/CHF_3/N_2 Plasma via Submillimeter Absorption Spectroscopy

NASA Astrophysics Data System (ADS)

Helal, Yaser H.; Neese, Christopher F.; De Lucia, Frank C.; Ewing, Paul R.; Agarwal, Ankur; Craver, Barry; Stout, Phillip J.; Armacost, Michael D.

2017-06-01

Plasmas used for the manufacturing of semiconductor devices are similar in pressure and temperature to those used in the laboratory for the study of astrophysical species in the submillimeter (SMM) spectral region. The methods and technology developed in the SMM for these laboratory studies are directly applicable for diagnostic measurements in the semiconductor manufacturing industry. Many of the molecular neutrals, radicals, and ions present in processing plasmas have been studied and their spectra have been cataloged or are in the literature. In this work, a continuous wave, intensity calibrated SMM absorption spectrometer was developed as a remote sensor of gas and plasma species. A major advantage of intensity calibrated rotational absorption spectroscopy is its ability to determine absolute concentrations and temperatures of plasma species from first principles without altering the plasma environment. An important part of this work was the design of the optical components which couple 500-750 GHz radiation through a commercial inductively coupled plasma chamber. The measurement of transmission spectra was simultaneously fit for background and absorption signal. The measured absorption was used to calculate absolute densities and temperatures of polar species. Measurements for CHF_3, CF_2, FCN, HCN, and CN made in a CF_4/CHF_3/N_2 plasma will be presented. Temperature equilibrium among species will be shown and the common temperature is leveraged to obtain accurate density measurements for simultaneously observed species. The densities and temperatures of plasma species are studied as a function of plasma parameters, including flow rate, pressure, and discharge power.

Physics and Industrial Development - Proceedings of the 2nd International Conference on Physics and Industrial Development

NASA Astrophysics Data System (ADS)

Gazzinelli, R.; Moreira, R. L.; Rodrigues, W. N.

1997-04-01

The Table of Contents for the full book PDF is as follows: * Preface * Sponsors * Committees * Opening Lecture * Relations between Science and Industry in Brazil * Technological Change and Economic Development * Science and Economic Development * Recent Technological Change and Industrial Dynamics * Technology and Economic Development: Suitability of the Institutional System of Minais Gerais * Bridging the Gap * Transfer of Scientific Results into Industry: A Controversial Problem in Central and Eastern Europe * Bridging the Gap Between Basic Research and Industrial Development at the J. STEFAN Institute * Liquid Crystals: A Case Study of the Interaction Between Science and Application * Role of Physics in the Modern Industrialization Process of Korea * Research in Industry * A Theoretical Physicist's 21-Year Experience in the Argentine Industry * Four Characters in Search of a Profession * Status and Prospects for the Use of Renewable Sources of Energy in Minas Gerais State-Brazil * University-Industry Cooperation I * Development and Industrialization of Fiber Optics Metrology Equipment * Finnish Experiences on University-Industry Collaboration in Materials Science and Physical Metallurgy * A Conceptual Framework for Understanding the Interaction between Academic Research and Industry * Technological Modernization of the Alkaline Cooking Process for the Production of Masa and Tortilla * The Fapergs Program on University Versus Private Enterprise * Integral Development Centers: Tying Mexican Industry With the National Polytechnic Institute * Materials Characterization and Applied Physics * Imaging Manganese Sulfide Inclusions in Grain Oriented Silicon Steels * Electrical Resistivity Changes Associated to Static Strain Aging in High Carbon Steel * PVD Hard Coatings for Wear Applications * Scanning Acoustic Microscopy: Application to Porous Materials * Indentation Testing of Thennal Sprayed WC-Co * Applications of Capillary Electrophoresis with Laserinduced Fluorescence Detector in Biological Sciences and Chemistry * Quality Assessment of Solder Bonds of Printed Circuit Boards by Metallography * Observation of InAs Nanostructures on (100)-GaAs Substrate with Atomic Force Microscopy * In Situ Observations By Atomic Force Microscopy of Corrosion of An Aluminium Film in a Solution of HCl * Atomic Force Microscopy of Metallurgical Interactions in Integrated Circuit Contacts * Atomic Force Microscopy of Microcavity Semiconductor Devices * Characterization of the Emitted Air Particies By Steel Industries * A Comparative Study of the Anodic Behavior of Duplex Stainless Steels - Din 1.4462-In Synthetic Sea-water * Study of the Corrosion Resistance of Duplex Stainless Steels in Solutions Containing Chlorides, Compared with other Stainless Steels * Development of New Materials and Devices * Development of the Electronic Signal in Proportional Detectors * Development of a Portable Ultrasound Equipment for Backfat Evaluation of Live Pigs * Thermal Barrier Coatings by Plasma Spraying * Scaling in Fragmentation Phenomena * A Study of Sn:In2O3 (ITO)/CuInSe2 Heterojunction for Solar Energy Applications * Organising a Ceramic Powder Shape Electronic Database * Feasibility of a Mixer Using the Negative Resistance of a SNS Junction * Characteristics of v-SiO2 Melted in Refractory Metal Furnace * Lasers for Industrial and Medical Applications * Portable Cat Scanner Applied to Collapsible Soil Studies * Experiments with Slip Casting of Fine Ceramics and v-SiO2 * R2Fe17 Halides: The Birth of a Material for Potential Hard Magnetic Applications * Computerized System for Embryos Freezing Protocols Development * Ferroelectric Parent Materials as Possible High-Tc Superconductors: High Temperature Magnetic and Electric Properties of Modified BNN and SBN * CVD Diamond: Emerging Technology for Many Applications * Development of New Techniques and Processes * Application of Mechanical Relaxation Spectroscopy to the Development of Low Carbon Steels * Measurement of Root Length by Digital Image Analysis * A Simple Model of a Glow Discharge Electron Beam for Materials Processing * Decorative Colored Oxide Coatings on Stainless Steel * Strengthening of Steel-Thermal-Sprayed -We-Co Interface * Protein Crystallography Station at LNLS * Fast Neural Systems for Experimental Physics and Industrial Applications: The Sennape Project * Automatic System for Measuring Myopia, Hyperopia and Astigmatism * The Feasibility of Pumping the He/Ne/H2, 585.3 nm Laser with the IPRl Steady State Triga Reactor * Optical and Mechanical Design of an Ophthalmic lnstrument: Slit Lamp * A Simple Model for Laser Ablation * University-Industry Cooperation II * From Basic Research in Plasma Physics to Applications in the Metal Mechanic Industry in Santa FE, Argentina * Role of the State in Bridging the Gap Between the Scientific and the Industrial Sectors. Experience in Province of Santa FE, Argentina * Physics in the BEM Program: Biomass-Energy-Materials * Production of Advanced Hard Materials - An Experience of Physical Research for Industry

Process development

NASA Technical Reports Server (NTRS)

Bickler, D. B.

1985-01-01

An overview is given of seven process development activities which were presented at this session. Pulsed excimer laser processing of photovoltaic cells was presented. A different pulsed excimer laser annealing was described using a 50 w laser. Diffusion barrier research focused on lowering the chemical reactivity of amorphous thin film on silicon. In another effort adherent and conductive films were successfully achieved. Other efforts were aimed at achieving a simultaneous front and back junction. Microwave enhanced plasma deposition experiments were performed. An updated version of the Solar Array Manufacturing Industry Costing Standards (SAMICS) was presented, along with a life cycle cost analysis of high efficiency cells. The last presentation was on the evaluation of the ethyl vinyl acetate encapsulating system.

Laser-driven electron beam and radiation sources for basic, medical and industrial sciences

PubMed Central

NAKAJIMA, Kazuhisa

2015-01-01

To date active research on laser-driven plasma-based accelerators have achieved great progress on production of high-energy, high-quality electron and photon beams in a compact scale. Such laser plasma accelerators have been envisaged bringing a wide range of applications in basic, medical and industrial sciences. Here inheriting the groundbreaker’s review article on “Laser Acceleration and its future” [Toshiki Tajima, (2010)],1) we would like to review recent progress of producing such electron beams due to relativistic laser-plasma interactions followed by laser wakefield acceleration and lead to the scaling formulas that are useful to design laser plasma accelerators with controllability of beam energy and charge. Lastly specific examples of such laser-driven electron/photon beam sources are illustrated. PMID:26062737

Ion plating for the future

NASA Technical Reports Server (NTRS)

Spalvins, T.

1981-01-01

The ion plating techniques are classified relative to the instrumental set up, evaporation media, and mode of transport. A distinction is drawn between the low vacuum (plasma) and high vacuum (ion beam) techniques. Ion plating technology is discussed at the fundamental and industrial level. At the fundamental level, the capabilities and limitations of the plasma (evaporant flux) and film characteristics are evaluated. And on the industrial level, the performance and potential uses of ion plated films are discussed.

Ion plating for the future

NASA Technical Reports Server (NTRS)

Spalvins, T.

1981-01-01

The ion plating techniques are classified relative to the instrumental set up, evaporation media and mode of transport. Distinction is drawn between the low vacuum (plasma) and high vacuum (ion beam) techniques. Ion plating technology is discussed at the fundamental and industrial level. At the fundamental level, the capabilities and limitations of the plasma (evaporant flux) and film characteristics are evaluated. On the industrial level, the performance and potential uses of ion plated films are discussed.

TOPICAL REVIEW: Physics and phenomena in pulsed magnetrons: an overview

NASA Astrophysics Data System (ADS)

Bradley, J. W.; Welzel, T.

2009-05-01

This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced literature and also hopefully as an inspiration for future studies.

A Fast MHD Code for Gravitationally Stratified Media using Graphical Processing Units: SMAUG

NASA Astrophysics Data System (ADS)

Griffiths, M. K.; Fedun, V.; Erdélyi, R.

2015-03-01

Parallelization techniques have been exploited most successfully by the gaming/graphics industry with the adoption of graphical processing units (GPUs), possessing hundreds of processor cores. The opportunity has been recognized by the computational sciences and engineering communities, who have recently harnessed successfully the numerical performance of GPUs. For example, parallel magnetohydrodynamic (MHD) algorithms are important for numerical modelling of highly inhomogeneous solar, astrophysical and geophysical plasmas. Here, we describe the implementation of SMAUG, the Sheffield Magnetohydrodynamics Algorithm Using GPUs. SMAUG is a 1-3D MHD code capable of modelling magnetized and gravitationally stratified plasma. The objective of this paper is to present the numerical methods and techniques used for porting the code to this novel and highly parallel compute architecture. The methods employed are justified by the performance benchmarks and validation results demonstrating that the code successfully simulates the physics for a range of test scenarios including a full 3D realistic model of wave propagation in the solar atmosphere.

Quality Assessment of Established and Emerging Blood Components for Transfusion

PubMed Central

Marks, Denese C.

2016-01-01

Blood is donated either as whole blood, with subsequent component processing, or through the use of apheresis devices that extract one or more components and return the rest of the donation to the donor. Blood component therapy supplanted whole blood transfusion in industrialized countries in the middle of the twentieth century and remains the standard of care for the majority of patients receiving a transfusion. Traditionally, blood has been processed into three main blood products: red blood cell concentrates; platelet concentrates; and transfusable plasma. Ensuring that these products are of high quality and that they deliver their intended benefits to patients throughout their shelf-life is a complex task. Further complexity has been added with the development of products stored under nonstandard conditions or subjected to additional manufacturing steps (e.g., cryopreserved platelets, irradiated red cells, and lyophilized plasma). Here we review established and emerging methodologies for assessing blood product quality and address controversies and uncertainties in this thriving and active field of investigation. PMID:28070448

Behavior and structure of metal vapor arc plasma between molten electrodes

NASA Astrophysics Data System (ADS)

Zanner, F. J.; Williamson, R. L.; Hareland, W. A.; Bertram, L. A.

A metal vapor arc is utilized in the industrially important vacuum arc remelting (VAR) process to produce materials by melting and resolidification which have improved structure and chemical homogeneity. Homogeneity is dependent on achieving quasi-steady conditions in the plasma because of its thermal and MHD coupling with the molten pool atop the ingot. Optimal operating conditions of low pressure (approx. = 0.01 torr) and short electrode gap (less than 15 mm) produce a diffuse arc and cathode spot behavior similar to that observed for the vacuum breaker arc. Under these conditions the arc provides a quasi-steady heat source that is considered to be the bench mark arc of the VAR process. Previous work has shown that deviation from the bench mark arc behavior can occur under production conditions, and is caused by electrode irregularities and liberation of gases such as CO from the molten pool. This study is an effort to characterize these behavioral deviations and discover operational conditions which stabilize the bench mark arc.

Secondary electron emission and its role in the space environment

NASA Astrophysics Data System (ADS)

Němeček, Z.; Pavlů, J.; Richterová, I.; Šafránková, J.; Vaverka, J.

2018-01-01

The role of dust in the space environment is of increasing interest in recent years and also the fast development of fusion devices with a magnetic confinement brought new issues in the plasma-surface interaction. Among other processes, secondary electron emission plays an important role for dust charging in interplanetary space and its importance increases at and above the surfaces of airless bodies like planets, moons, comets or asteroids. A similar situation can be found in many industrial applications where the dust is a final product or an unintentional impurity. The present paper reviews the progress in laboratory investigations of the secondary emission process as well as an evolution of the modeling of the interaction of energetic electrons with dust grains of different materials and sizes. The results of the model are discussed in view of latest laboratory simulations and they are finally applied on the estimation of an interaction of the solar wind and magnetospheric plasmas with the dust attached to or levitating above the lunar surface.

Comparison of cyanide exposure markers in the biofluids of smokers and non-smokers.

PubMed

Vinnakota, Chakravarthy V; Peetha, Naga S; Perrizo, Mitch G; Ferris, David G; Oda, Robert P; Rockwood, Gary A; Logue, Brian A

2012-11-01

Cyanide is highly toxic and is present in many foods, combustion products (e.g. cigarette smoke), industrial processes, and has been used as a terrorist weapon. In this study, cyanide and its major metabolites, thiocyanate and 2-amino-2-thiazoline-4-carboxylic acid (ATCA), were analyzed from various human biofluids of smokers (low-level chronic cyanide exposure group) and non-smokers to gain insight into the relationship of these biomarkers to cyanide exposure. The concentrations of each biomarker tested were elevated for smokers in each biofluid. Significant differences (p < 0.05) were found for thiocyanate in plasma and urine, and ATCA showed significant differences in plasma and saliva. Additionally, biomarker concentration ratios, correlations between markers of cyanide exposure, and other statistical methods were performed to better understand the relationship between cyanide and its metabolites. Of the markers studied, the results indicate plasma ATCA, in particular, showed excellent promise as a biomarker for chronic low-level cyanide exposure.

Perfluorooctane Sulfonate Plasma Half-Life Determination and Long-Term Tissue Distribution in Beef Cattle (Bos taurus).

PubMed

Lupton, Sara J; Dearfield, Kerry L; Johnston, John J; Wagner, Sarah; Huwe, Janice K

2015-12-30

Perfluorooctane sulfonate (PFOS) is used in consumer products as a surfactant and is found in industrial and consumer waste, which ends up in wastewater treatment plants (WWTPs). PFOS does not breakdown during WWTP processes and accumulates in the biosolids. Common practices include application of biosolids to pastures and croplands used for feed, and as a result, animals such as beef cattle are exposed to PFOS. To determine plasma and tissue depletion kinetics in cattle, 2 steers and 4 heifers were dosed with PFOS at 0.098 mg/kg body weight and 9.1 mg/kg, respectively. Plasma depletion half-lives for steers and heifers were 120 ± 4.1 and 106 ± 23.1 days, respectively. Specific tissue depletion half-lives ranged from 36 to 385 days for intraperitoneal fat, back fat, muscle, liver, bone, and kidney. These data indicate that PFOS in beef cattle has a sufficiently long depletion half-life to permit accumulation in edible tissues.

Optical fiber characteristics and standards; Proceedings of the Meeting, Cannes, France, November 25-27, 1985

NASA Technical Reports Server (NTRS)

Bouillie, Remy (Editor)

1986-01-01

Papers are presented on outside vapor deposition, the plasma activated CVD process for large scale production of telecommunication fibers, axial lateral plasma deposition technology from plastic clad silica, coatings for optical fibers, primary coating characterization, and radiation-induced time dependent attenuation in a fiber. Topics discussed include fibers with high tensile strength, the characteristics and specifications of airborne fiber optic components, the baseband frequency response of multimode fibers, and fibers for local and broadband networks. Consideration is given to industrial measurements for single mode and multimode fibers, the characterization of source power distribution in a multimode fiber by a splice offset technique, the measurement of chromatic dispersion in a single mode optical, and the effect of temperature on the refracted near-field optical fiber profiling technique.

Thermodynamic properties and transport coefficients of two-temperature helium thermal plasmas

NASA Astrophysics Data System (ADS)

Guo, Xiaoxue; Murphy, Anthony B.; Li, Xingwen

2017-03-01

Helium thermal plasmas are in widespread use in arc welding and many other industrial applications. Simulation of these processes relies on accurate plasma property data, such as plasma composition, thermodynamic properties and transport coefficients. Departures from LTE (local thermodynamic equilibrium) generally occur in some regions of helium plasmas. In this paper, properties are calculated allowing for different values of the electron temperature, T e, and heavy-species temperature, T h, at atmospheric pressure from 300 K to 30 000 K. The plasma composition is first calculated using the mass action law, and the two-temperature thermodynamic properties are then derived. The viscosity, diffusion coefficients, electrical conductivity and thermal conductivity of the two-temperature helium thermal plasma are obtained using a recently-developed method that retains coupling between electrons and heavy species by including the electron-heavy-species collision term in the heavy-species Boltzmann equation. It is shown that the viscosity and the diffusion coefficients strongly depend on non-equilibrium ratio θ (θ ={{T}\\text{e}}/{{T}\\text{h}} ), through the plasma composition and the collision integrals. The electrical conductivity, which depends on the electron number density and ordinary diffusion coefficients, and the thermal conductivity have similar dependencies. The choice of definition of the Debye length is shown to affect the electrical conductivity significantly for θ  >  1. By comparing with literature data, it is shown that the coupling between electrons and heavy species has a significant influence on the electrical conductivity, but not on the viscosity. Plasma properties are tabulated in the supplementary data.

The use of plasma technology for the treatment of noxious waste

NASA Astrophysics Data System (ADS)

Wilman, Jonathan James

This thesis begins by describing the common types of air pollution and the main effects of these pollutants. Natural and man-made sources are discussed as well as the current types of technology used for reduction of common pollutants. The use of atmospheric pressure non-thermal plasma reactors for the control of pollutants is introduced at this stage. The second chapter describes the different types of atmospheric pressure non-thermal reactor designs and their modes of operation. The fundamental processes behind the production of plasmas are discussed and the chemistry of some simple discharges is also presented. The third chapter begins the experimental and modelling work done at Manchester on the destruction of volatile organic compounds (VOCs) using packed bed reactors and pulsed corona reactors. This chapter is concerned with the destruction of toluene and its behaviour as the oxygen content of the carrier gas, flowing through the reactor, is changed. Work using a pulsed corona reactor is also presented showing the destruction of toluene as a function of the applied specific energy. A model is constructed using mainly atmospheric reactions and the predictions are compared with experimental values. The fourth chapter discusses the destruction of dichloromethane (DCM) as a function of the oxygen content of the carrier gas. A model is constructed, again from mainly atmospheric reactions, and the predictions compared with the experimental data obtained. Methane is chosen as a molecule to study in the fifth chapter. A model is constructed and compared with experimental findings, showing that the chemistry of non-thermal plasmas can be effectively represented using neutral gas phase chemistry. Finally chapter six is concerned with the use of a large scale pulsed corona system for the reduction of NO[x] in industrial flue gas. This system has been tested on a modem incinerator, showing encouraging results. The workings of a modem incinerator are described together with those of the corona facility and any instruments used in these tests. Some experimental results are discussed. The aim of this chapter is to show that plasma reactors can be scaled up for industrial use. This section also discusses the difficulty of analysing and working with industrial gases and large scale apparatus as opposed to laboratory scale experiments.

Formation of Wear Resistant Steel Surfaces by Plasma Immersion Ion Implantation

NASA Astrophysics Data System (ADS)

Mändl, S.; Rauschenbach, B.

2003-08-01

Plasma immersion ion implantation (PIII) is a versatile and fast method for implanting energetic ions into large and complex shaped three-dimensional objects where the ions are accelerated by applying negative high voltage pulses to a substrate immersed in a plasma. As the line-of-sight restrictions of conventional implanters are circumvented, it results in a fast and cost-effective technology. Implantation of nitrogen at 30 - 40 keV at moderate temperatures of 200 - 400 °C into steel circumvents the diminishing thermal nitrogen activation encountered, e.g., in plasma nitriding in this temperature regime, thus enabling nitriding of additional steel grades. Nitride formation and improvement of the mechanical properties after PIII are presented for several steel grades, including AISI 316Ti (food industry), AISI D2 (used for bending tools) and AISI 1095 (with applications in the textile industry).

Solution-Processed Cu 2Se Nanocrystal Films with Bulk-Like Thermoelectric Performance

DOE Office of Scientific and Technical Information (OSTI.GOV)

Forster, Jason D.; Lynch, Jared J.; Coates, Nelson E.

Thermoelectric power generation can play a key role in a sustainable energy future by converting waste heat from power plants and other industrial processes into usable electrical power. Current thermoelectric devices, however, require energy intensive manufacturing processes such as alloying and spark plasma sintering. Here, we describe the fabrication of a p-type thermoelectric material, copper selenide (Cu 2 Se), utilizing solution-processing and thermal annealing to produce a thin film that achieves a figure of merit, ZT, which is as high as its traditionally processed counterpart, a value of 0.14 at room temperature. This is the first report of amore » fully solution-processed nanomaterial achieving performance equivalent to its bulk form and represents a general strategy to reduce the energy required to manufacture advanced energy conversion and harvesting materials.« less

Solution-Processed Cu 2Se Nanocrystal Films with Bulk-Like Thermoelectric Performance

DOE PAGES

Forster, Jason D.; Lynch, Jared J.; Coates, Nelson E.; ...

2017-06-05

Thermoelectric power generation can play a key role in a sustainable energy future by converting waste heat from power plants and other industrial processes into usable electrical power. Current thermoelectric devices, however, require energy intensive manufacturing processes such as alloying and spark plasma sintering. Here, we describe the fabrication of a p-type thermoelectric material, copper selenide (Cu 2 Se), utilizing solution-processing and thermal annealing to produce a thin film that achieves a figure of merit, ZT, which is as high as its traditionally processed counterpart, a value of 0.14 at room temperature. This is the first report of amore » fully solution-processed nanomaterial achieving performance equivalent to its bulk form and represents a general strategy to reduce the energy required to manufacture advanced energy conversion and harvesting materials.« less

Laser-Induced-Emission Spectroscopy In Hg/Ar Discharge

NASA Technical Reports Server (NTRS)

Maleki, Lutfollah; Blasenheim, Barry J.; Janik, Gary R.

1992-01-01

Laser-induced-emission (LIE) spectroscopy used to probe low-pressure mercury/argon discharge to determine influence of mercury atoms in metastable 6(Sup3)P(Sub2) state on emission of light from discharge. LIE used to study all excitation processes affected by metastable population, including possible effects on excitation of atoms, ions, and buffer gas. Technique applied to emissions of other plasmas. Provides data used to make more-accurate models of such emissions, exploited by lighting and laser industries and by laboratories studying discharges. Also useful in making quantitative measurements of relative rates and cross sections of direct and two-step collisional processes involving metastable level.

Disinfection effect of non-thermal atmospheric pressure plasma for foodborne bacteria

NASA Astrophysics Data System (ADS)

Pervez, Mohammad Rasel; Inomata, Takanori; Ishijima, Tatsuo; Kakikawa, Makiko; Uesugi, Yoshihiko; Tanaka, Yasunori; Yano, Toshihiro; Miwa, Shoji; Noguchi, Akinori

2015-09-01

Non-thermal atmospheric pressure plasma (NAPP) exposure can be a suitable alternative for bacteria inactivation in food processing industry. Specimen placed in the enclosure are exposed to various reactive radicals produced within the discharge chamber. It is also exposed to the periodic variation of the electric field strength in the chamber. Dielectric barrier discharge is produced by high voltage pulse (Vpp = 18 kV, pulse width 20 μs, repetition frequency 10 kHz) in a polypropylene box (volume = 350 cm3) using helium as main feed gas. Inactivation efficiency of NAPP depends on the duration of NAPP exposure, applied voltage pulse strength and type, pulse duration, electrode separation and feed gas composition. In this study we have investigated inactivation of Bacillus lichenformis spore as an example of food borne bacteria. Keeping applied voltage, electrode configuration and total gas flow rate constant, spores are exposed to direct NAPP for different time duration while O2 concentration in the feed gas composition is varied. 10 minutes NAPP exposure resulted in ~ 3 log reduction of Bacillus lichenformis spores for 1% O2concentration (initial concentration ~ 106 / specimen). This work is supported by research and development promotion grant provided by the Hokuriku Industrial Advancement Center.

Homojunction silicon solar cells doping by ion implantation

NASA Astrophysics Data System (ADS)

Milési, Frédéric; Coig, Marianne; Lerat, Jean-François; Desrues, Thibaut; Le Perchec, Jérôme; Lanterne, Adeline; Lachal, Laurent; Mazen, Frédéric

2017-10-01

Production costs and energy efficiency are the main priorities for the photovoltaic (PV) industry (COP21 conclusions). To lower costs and increase efficiency, we are proposing to reduce the number of processing steps involved in the manufacture of N-type Passivated Rear Totally Diffused (PERT) silicon solar cells. Replacing the conventional thermal diffusion doping steps by ion implantation followed by thermal annealing allows reducing the number of steps from 7 to 3 while maintaining similar efficiency. This alternative approach was investigated in the present work. Beamline and plasma immersion ion implantation (BLII and PIII) methods were used to insert n-(phosphorus) and p-type (boron) dopants into the Si substrate. With higher throughput and lower costs, PIII is a better candidate for the photovoltaic industry, compared to BL. However, the optimization of the plasma conditions is demanding and more complex than the beamline approach. Subsequent annealing was performed on selected samples to activate the dopants on both sides of the solar cell. Two annealing methods were investigated: soak and spike thermal annealing. Best performing solar cells, showing a PV efficiency of about 20%, was obtained using spike annealing with adapted ion implantation conditions.

Decontamination of prions in a plasma product manufacturing environment.

PubMed

Bellon, Anne; Comoy, Emmanuel; Simoneau, Steve; Mornac, Sandrine; Dehen, Capucine; Perrin, Audrey; Arzel, Aude; Arrabal, Samuel; Baron, Henry; Laude, Hubert; You, Bruno; Deslys, Jean-Philippe; Flan, Benoit

2014-04-01

The high resistance of prions to inactivating treatments requires the proper management of decontaminating procedures of equipment in contact with materials of human or animal origin destined for medical purposes. Sodium hydroxide (NaOH) is widely used today for this purpose as it inactivates a wide variety of pathogens including prions. Several NaOH treatments were tested on prions bound to either stainless steel or chromatographic resins in industrial conditions with multiple prion strains. Data show a strong correlation between inactivation results obtained by immunochemical detection of the prion protein and those obtained with infectivity assays and establish effective inactivation treatments for prions bound to stainless steel or chromatographic resins (ion exchange and affinity), including treatments with lower NaOH concentrations. Furthermore, no obvious strain-specific behavior difference was observed between experimental models. The results generated by these investigations show that industrial NaOH decontamination regimens (in combination with the NaCl elution in the case of the chromatography process) attain substantial prion inactivation and/or removal between batches, thus providing added assurance to the biologic safety of the final plasma-derived medicinal products. © 2013 American Association of Blood Banks.

Biodiesel production using fatty acids from food industry waste using corona discharge plasma technology.

PubMed

Cubas, A L V; Machado, M M; Pinto, C R S C; Moecke, E H S; Dutra, A R A

2016-01-01

This article aims to describe an alternative and innovative methodology to transform waste, frying oil in a potential energy source, the biodiesel. The biodiesel was produced from fatty acids, using a waste product of the food industry as the raw material. The methodology to be described is the corona discharge plasma technology, which offers advantages such as acceleration of the esterification reaction, easy separation of the biodiesel and the elimination of waste generation. The best conditions were found to be an oil/methanol molar ratio of 6:1, ambient temperature (25 °C) and reaction time of 110 min and 30 mL of sample. The acid value indicates the content of free fatty acids in the biodiesel and the value obtained in this study was 0.43 mg KOH/g. Peaks corresponding to octadecadienoic acid methyl ester, octadecanoic acid methyl ester and octadecenoic acid methyl ester, from the biodiesel composition, were identified using GC-MS. A major advantage of this process is that the methyl ester can be obtained in the absence of chemical catalysts and without the formation of the co-product (glycerin). Copyright © 2015 Elsevier Ltd. All rights reserved.

Space Technology for the Iron Foundry

NASA Technical Reports Server (NTRS)

1990-01-01

Electric Power Research Institute (EPRI) initiated development of a plasma melter intended to solve a major problem in the U.S. foundry industry. EPRI is a non-profit organization that manages research and development for some 600 electric utility member companies. For the plasma melter program, EPRI enlisted as co-sponsors Westinghouse Electric's Environmental Systems and Services Division, General Motors Corporation, and Modern Equipment Company, supplier of equipment and services to the foundry industry. General Motor's plasma melter, first in the U.S., is an advanced technology system designed to improve the efficiency of coke-burning cupolas that melt iron to produce automotive castings. The key elements are six Westinghouse plasma torches. Electrically-powered plasma torch creates an ionized gas that superheats air entering the cupola to 10,000 degrees Fahrenheit. That great heat, three times higher than that attainable by oil or natural gas systems, is the key to making iron cheaper, cleaner, and faster. System offers an environmental bonus in reduced cupola emissions. Plasma torches increase GM's electric bill at Defiance, but that cost is more than compensated by the savings in charge material. The EPRI-sponsored Center for Materials Production (CMP) is evaluating the potential of plasma cupola technology.

Monte Carlo simulation of ion-material interactions in nuclear fusion devices

NASA Astrophysics Data System (ADS)

Nieto Perez, M.; Avalos-Zuñiga, R.; Ramos, G.

2017-06-01

One of the key aspects regarding the technological development of nuclear fusion reactors is the understanding of the interaction between high-energy ions coming from the confined plasma and the materials that the plasma-facing components are made of. Among the multiple issues important to plasma-wall interactions in fusion devices, physical erosion and composition changes induced by energetic particle bombardment are considered critical due to possible material flaking, changes to surface roughness, impurity transport and the alteration of physicochemical properties of the near surface region due to phenomena such as redeposition or implantation. A Monte Carlo code named MATILDA (Modeling of Atomic Transport in Layered Dynamic Arrays) has been developed over the years to study phenomena related to ion beam bombardment such as erosion rate, composition changes, interphase mixing and material redeposition, which are relevant issues to plasma-aided manufacturing of microelectronics, components on object exposed to intense solar wind, fusion reactor technology and other important industrial fields. In the present work, the code is applied to study three cases of plasma material interactions relevant to fusion devices in order to highlight the code's capabilities: (1) the Be redeposition process on the ITER divertor, (2) physical erosion enhancement in castellated surfaces and (3) damage to multilayer mirrors used on EUV diagnostics in fusion devices due to particle bombardment.

Potential of electric discharge plasma methods in abatement of volatile organic compounds originating from the food industry.

PubMed

Preis, S; Klauson, D; Gregor, A

2013-01-15

Increased volatile organic compounds emissions and commensurate tightening of applicable legislation mean that the development and application of effective, cost-efficient abatement methods are areas of growing concern. This paper reviews the last two decades' publications on organic vapour emissions from food processing, their sources, impacts and treatment methods. An overview of the latest developments in conventional air treatment methods is presented, followed by the main focus of the paper, non-thermal plasma technology. The results of the review suggest that non-thermal plasma technology, in its pulsed corona discharge configuration, is an emerging treatment method with potential for low-cost, effective abatement of a wide spectrum of organic air pollutants. It is found that the combination of plasma treatment with catalysis is a development trend that demonstrates considerable potential. The as yet relatively small number of plasma treatment applications is considered to be due to the novelty of pulsed electric discharge techniques and a lack of reliable pulse generators and reactors. Other issues acting as barriers to widespread adoption of the technique include the possible formation of stable oxidation by-products, residual ozone and nitrogen oxides, and sensitivity towards air humidity. Copyright © 2012 Elsevier Ltd. All rights reserved.

Numerical modeling of materials processes with fluid-fluid interfaces

NASA Astrophysics Data System (ADS)

Yanke, Jeffrey Michael

A numerical model has been developed to study material processes that depend on the interaction between fluids with a large discontinuity in thermophysical properties. A base model capable of solving equations of mass, momentum, energy conservation, and solidification has been altered to enable tracking of the interface between two immiscible fluids and correctly predict the interface deformation using a volume of fluid (VOF) method. Two materials processes investigated using this technique are Electroslag Remelting (ESR) and plasma spray deposition. ESR is a secondary melting technique that passes an AC current through an electrically resistive slag to provide the heat necessary to melt the alloy. The simulation tracks the interface between the slag and metal. The model was validated against industrial scale ESR ingots and was able to predict trends in melt rate, sump depth, macrosegregation, and liquid sump depth. In order to better understand the underlying physics of the process, several constant current ESR runs simulated the effects of freezing slag in the model. Including the solidifying slag in the imulations was found to have an effect on the melt rate and sump shape but there is too much uncertainty in ESR slag property data at this time for quantitative predictions. The second process investigated in this work is the deposition of ceramic coatings via plasma spray deposition. In plasma spray deposition, powderized coating material is injected into a plasma that melts and carries the powder towards the substrate were it impacts, flattening out and freezing. The impacting droplets pile up to form a porous coating. The model is used to simulate this rain of liquid ceramic particles impacting the substrate and forming a coating. Trends in local solidification time and porosity are calculated for various particle sizes and velocities. The predictions of decreasing porosity with increasing particle velocity matches previous experimental results. Also, a preliminary study was conducted to investigate the effects of substrate surface defects and droplet impact angle on the propensity to form columnar porosity.

Effects of the addition of blood plasma proteins on physico-chemical properties of emulsion-type pork sausage during cold storage.

PubMed

Kim, Sungho; Jin, Sangkeun; Choi, Jungseok

2017-10-01

Most slaughter blood is discarded, resulting in problems related to costs for wastewater disposal and environmental pollution. However, animal blood contains various proteins such as albumin, globulin and globin and can be used as a natural emulsifier, stabiliser and colour additive. Thus, this study was carried out to investigate the effect of blood plasma proteins on the physico-chemical properties of emulsion-type pork sausages stored at 4°C over 5 weeks. The emulsion-type pork sausages with plasma powders had higher pH than the other treatments during week 5, and higher shear force than the control (P < 0.05). The lightness values of the sausages with plasma powders were lower than the other treatments, whereas the redness and yellowness values were similar with those of the others. The sausages with plasma powders (cattle plasma powder and commercial pig plasma powder) had respectively increased texture properties. In the sensory evaluation, all proteins did not have significant impact on sensory of pork sausages. The results confirmed that plasma protein powders can be considered as a binder for the production of excellent meat products compared to other binders. © 2017 Society of Chemical Industry. © 2017 Society of Chemical Industry.

Development, diagnostic and applications of radio-frequency plasma reactor

NASA Astrophysics Data System (ADS)

Puac, N.

2008-07-01

In many areas of the industry, plasma processing of materials is a vital technology. Nonequilibrium plasmas proved to be able to produce chemically reactive species at a low gas temperature while maintaining highly uniform reaction rates over relatively large areas (Makabe and Petrovic 2006). At the same time nonequilibrium plasmas provide means for good and precise control of the properties of active particles that determine the surface modification. Plasma needle is one of the atmospheric pressure sources that can be used for treatment of the living matter which is highly sensitive when it comes to low pressure or high temperatures (above 40 C). Dependent on plasma conditions, several refined cell responses are induced in mammalian cells (Sladek et al. 2005). It appears that plasma treatment may find many biomedical applications. However, there are few data in the literature about plasma effects on plant cells and tissues. So far, only the effect of low pressure plasmas on seeds was investigated. It was shown that short duration pretreatments by non equilibrium low temperature air plasma were stimulative in light induced germination of Paulownia tomentosa seeds (Puac et al. 2005). As membranes of plants have different properties to those of animals and as they show a wide range of properties we have tried to survey some of the effects of typical plasma which is envisaged to be used in biotechnological applications on plant cells. In this paper we will make a comparison between two configurations of plasma needle that we have used in treatment of biological samples (Puac et al. 2006). Difference between these two configurations is in the additional copper ring that we have placed around glass tube at the tip of the needle. We will show some of the electrical characteristics of the plasma needle (with and without additional copper ring) and, also, plasma emission intensity obtained by using fast ICCD camera.

A review on microbiological decontamination of fresh produce with nonthermal plasma.

PubMed

Pignata, C; D'Angelo, D; Fea, E; Gilli, G

2017-06-01

Food safety is a critical public health issue for consumers and the food industry because microbiological contamination of food causes considerable social and economic burdens on health care. Most foodborne illness comes from animal production, but as of the mid-1990s in the United States and more recently in the European Union, the contribution of fresh produce to foodborne outbreaks has rapidly increased. Recent studies have suggested that sterilization with nonthermal plasma could be a viable alternative to the traditional methods for the decontamination of heat-sensitive materials or food because this technique proves capable of eliminating micro-organisms on surfaces without altering the substrate. In the last 10 years, researchers have used nonthermal plasma in a variety of food inoculated with many bacterial species. All of these experiments were conducted exclusively in a laboratory and, to our knowledge, this technique has not been used in an industrial setting. Thus, the purpose of this review is to understand whether this technology could be used at the industrial level. The latest researches using nonthermal plasma on fresh produce were analysed. These evaluations have focused on the log reduction of micro-organisms and the treatment time. © 2017 The Society for Applied Microbiology.

Higher Temperature Thermal Barrier Coatings with the Combined Use of Yttrium Aluminum Garnet and the Solution Precursor Plasma Spray Process

NASA Astrophysics Data System (ADS)

Gell, Maurice; Wang, Jiwen; Kumar, Rishi; Roth, Jeffery; Jiang, Chen; Jordan, Eric H.

2018-04-01

Gas-turbine engines are widely used in transportation, energy and defense industries. The increasing demand for more efficient gas turbines requires higher turbine operating temperatures. For more than 40 years, yttria-stabilized zirconia (YSZ) has been the dominant thermal barrier coating (TBC) due to its outstanding material properties. However, the practical use of YSZ-based TBCs is limited to approximately 1200 °C. Developing new, higher temperature TBCs has proven challenging to satisfy the multiple property requirements of a durable TBC. In this study, an advanced TBC has been developed by using the solution precursor plasma spray (SPPS) process that generates unique engineered microstructures with the higher temperature yttrium aluminum garnet (YAG) to produce a TBC that can meet and exceed the major performance standards of state-of-the-art air plasma sprayed YSZ, including: phase stability, sintering resistance, CMAS resistance, thermal cycle durability, thermal conductivity and erosion resistance. The temperature improvement for hot section gas turbine materials (superalloys & TBCs) has been at the rate of about 50 °C per decade over the last 50 years. In contrast, SPPS YAG TBCs offer the near-term potential of a > 200 °C improvement in temperature capability.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Reiersen, W.; Heitzenroeder, P.; Neilson, G. H.

The National Compact Stellarator Experiment (NCSX) is being constructed at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The stellarator core is designed to produce a compact 3-D plasma that combines stellarator and tokamak physics advantages. The engineering challenges of NCSX stem from its complex geometry. From the project's start in April, 2003 to September, 2004, the fabrication specifications for the project's two long-lead components, the modular coil winding forms and the vacuum vessel, were developed. An industrial manufacturing R&D program refined the processes for their fabrication as well as production cost andmore » schedule estimates. The project passed a series of reviews and established its performance baseline with the Department of Energy. In September 2004, fabrication was approved and contracts for these components were awarded. The suppliers have completed the engineering and tooling preparations and are in production. Meanwhile, the project completed preparations for winding the coils at PPPL by installing a coil manufacturing facility and developing all necessary processes through R&D. The main activities for the next two years will be component manufacture, coil winding, and sub-assembly of the vacuum vessel and coil subsets. Machine sector sub-assembly, machine assembly, and testing will follow, leading to First Plasma in July 2009.« less

Low-temperature graphene synthesis using microwave plasma CVD

NASA Astrophysics Data System (ADS)

Yamada, Takatoshi; Kim, Jaeho; Ishihara, Masatou; Hasegawa, Masataka

2013-02-01

The graphene chemical vapour deposition (CVD) technique at substrate temperatures around 300 °C by a microwave plasma sustained by surface waves (surface wave plasma chemical vapour deposition, SWP-CVD) is discussed. A low-temperature, large-area and high-deposition-rate CVD process for graphene films was developed. It was found from Raman spectra that the deposited films on copper (Cu) substrates consisted of high-quality graphene flakes. The fabricated graphene transparent conductive electrode showed uniform optical transmittance and sheet resistance, which suggests the possibility of graphene for practical electrical and optoelectronic applications. It is intriguing that graphene was successfully deposited on aluminium (Al) substrates, for which we did not expect the catalytic effect to decompose hydrocarbon and hydrogen molecules. We developed a roll-to-roll SWP-CVD system for continuous graphene film deposition towards industrial mass production. A pair of winder and unwinder systems of Cu film was installed in the plasma CVD apparatus. Uniform Raman spectra were confirmed over the whole width of 297 mm of Cu films. We successfully transferred the deposited graphene onto PET films, and confirmed a transmittance of about 95% and a sheet resistance of less than 7 × 105 Ω/sq.

Comparison of Langmuir probe and multipole resonance probe measurements in argon, hydrogen, nitrogen, and oxygen mixtures in a double ICP discharge

NASA Astrophysics Data System (ADS)

Fiebrandt, Marcel; Oberberg, Moritz; Awakowicz, Peter

2017-07-01

The results of a Multipole Resonance Probe (MRP) are compared to a Langmuir probe in measuring the electron density in Ar, H2, N2, and O2 mixtures. The MRP was designed for measurements in industry processes, i.e., coating or etching. To evaluate a possible influence on the MRP measurement due to molecular gases, different plasmas with increasing molecular gas content in a double inductively coupled plasma at 5 Pa and 10 Pa at 500 W are used. The determined electron densities from the MRP and the Langmuir probe slightly differ in H2 and N2 diluted argon plasmas, but diverge significantly with oxygen. In pure molecular gas plasmas, electron densities measured with the MRP are always higher than those measured with the Langmuir Probe, in particular, in oxygen containing mixtures. The differences can be attributed to etching of the tungsten wire in the Ar:O2 mixtures and rf distortion in the pure molecular discharges. The influence of a non-Maxwellian electron energy distribution function, negative ions or secondary electron emission seems to be of no or only minor importance.

Thermal barrier coating life-prediction model development

NASA Technical Reports Server (NTRS)

Strangman, T. E.; Neumann, J.

1985-01-01

Life predictions are made for two types of strain-tolerant and oxidation-resistant Thermal Barrier Coating (TBC) systems produced by commercial coating suppliers to the gas turbine industry. The plasma-sprayed TBC system, composed of a low-pressure plasma spray (LPPS) applied oxidation-resistant NiCrAlY bond coating and an air-plasma-sprayed yttria (8 percent) partially stabilized zirconia insulative layer, is applied by both Chromalloy and Klock. The second type of TBC is applied by the electron-beam/physical vapor deposition process by Temescal. Thermomechanical and thermochemical testing of the program TBCs is in progress. A number of the former tests has been completed. Fracture mechanics data for the Chromalloy plasma-sprayed TBC system indicate that the cohesive toughness of the zirconia layer is increased by thermal cycling and reduced by high temperature exposure at 1150 C. Eddy current technology feasibility has been established with respect to nondestructively measuring zirconia layer thickness of a TBC system. High pressure turbine blades have been coated with program TBC systems for a piggyback test in a TFE731-5 turbofan factory engine test. Data from this test will be used to validate the TBC life models.

The Mutation Breeding and Mutagenic Effect of Air Plasma on Penicillium Chrysogenum

NASA Astrophysics Data System (ADS)

Gui, Fang; Wang, Hui; Wang, Peng; Liu, Hui; Cai, Xiaochun; Hu, Yihua; Yuan, Chengling; Zheng, Zhiming

2012-04-01

Low temperature air plasma was used as the mutation tool for penicillin-producing strain Penicillium chrysogenum. The discharge conditions were RF power of 360 W, temperature of 40°C in a sealed chamber, and pressure of 10 Pa to 30 Pa. The result showed that the kinetics of the survival rate followed a typical saddle-shaped curve. Based on a statistic analysis, at the treating duration of 10 min, the positive mutation rate was as high as 37.5% while the negative mutation rate was low. The colonial morphology changed obviously when the plasma treating duration reached or exceeded 45 min. After both primary and secondary screening, a mutant designated as aPc051310 with high productivity of penicillin was obtained, and a strong mutagenic effect on P. chrysogenum was observed in the process. It was proved that after five generations, the mutant aPc051310 still exhibits a high productivity. All the results prove that the plasma mutation method could be developed as a convenient and effective tool to breed high-yield strains in the fermentation industry, while expanding the plasm application at the same time.

GMP in blood collection and processing.

PubMed

Wagstaff, W

1998-01-01

The principles of Good Manufacturing Practice have, in the main, been universally developed for the guidance of the pharmaceutical industry rather than for transfusion services. However, these rules and guides are increasingly being adapted for use in blood centres, in the production of labile blood components and of plasma for fractionation. The guide for pharmaceutical industries produced by the commission of the European Communities is used as a model here, the nine basic requirements being those applicable to Quality Management, personnel, premises and equipment, document, production, Quality Control, contract manufacture and analysis, complaints and product recall, and self-inspection. Though having more direct application to the production laboratory preparing blood components, the majority of these requirements and principles are also directly applicable to all of the activities involved in blood collection.

Inertization of heavy metals present in galvanic sludge by DC thermal plasma.

PubMed

Leal Vieira Cubas, Anelise; de Medeiros Machado, Marília; de Medeiros Machado, Marina; Gross, Frederico; Magnago, Rachel Faverzani; Moecke, Elisa Helena Siegel; Gonçalvez de Souza, Ivan

2014-01-01

Galvanic sludge results from the treatment of effluents generated by the industrial metal surface treatment of industrial material, which consists in the deposition of a metal on a surface or a metal surface attack, for example, electrodeposition of conductors (metals) and non conductive, phosphate, anodizing, oxidation and/or printed circuit. The treatment proposed here is exposure of the galvanic sludge to the high temperatures provided by thermal plasma, a process which aims to vitrify the galvanic sludge and render metals (iron, zinc, and chromium) inert. Two different plasma reactors were assembled: with a DC transferred arc plasma torch and with a DC nontransferred arc plasma torch. In this way it was possible to verify which reactor was more efficient in the inertization of the metals and also to investigate whether the addition of quartzite sand to the sludge influences the vitrification of the material. Quantification of water content and density of the galvanic raw sludge were performed, as well as analyzes of total organic carbon (TOC) and identify the elements that make up the raw sludge through spectroscopy X-ray fluorescence (XRF). The chemical composition and the form of the pyrolyzed and vitrified sludge were analyzed by scanning electron microscopy with energy-dispersive X-ray spectrometer (SEM-EDS) analysis, which it is a analysis that shows the chemical of the sample surface. The inertization of the sludge was verified in leaching tests, where the leachate was analyzed by flame atomic absorption spectroscopy (FAAS). The results of water content and density were 64.35% and 2.994 g.cm(-3), respectively. The TOC analysis determined 1.73% of C in the sample of galvanic raw sludge, and XRF analysis determined the most stable elements in the sample, and showed the highest peaks (higher stability) were Fe, Zn, and Cr. The efficiency of the sludge inertization was 100% for chromium, 99% for zinc, and 100% for iron. The results also showed that the most efficient reactor was that with the DC transferred arc plasma torch and quartzite sand positively influenced by the vitrification during the pyrolysis of the galvanic sludge.

INTERIOR VIEW, LOOKING SOUTHWEST, WITH PLASMA ARC BURNING MACHINE (GALT ...

Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

INTERIOR VIEW, LOOKING SOUTHWEST, WITH PLASMA ARC BURNING MACHINE (GALT INDUSTRIES) WHICH CUTS STEEL SHAPES AND OPERATOR PHILIP WILLOUBY. - O'Neal Steel, Incorporated, Fabrication Shop, 744 Forty-first Avenue North, Birmingham, Jefferson County, AL

Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costs

NASA Astrophysics Data System (ADS)

Keens, Simon; Rossa, Bernhard; Frei, Marcel

2016-03-01

As the semiconductor industry proceeds to develop ever better sources of extreme ultraviolet (EUV) light for photolithography applications, two distinct technologies have come to prominence: Tin-plasma and free electron laser (FEL) sources. Tin plasma sources have been in development within the industry for many years, and have been widely reported. Meanwhile, FELs represent the most promising alternative to create high power EUV frequencies and, while tin-plasma source development has been ongoing, such lasers have been continuously developed by academic institutions for use in fundamental research programmes in conjunction with universities and national scientific institutions. This paper follows developments in the field of academic FELs, and presents information regarding novel technologies, specifically in the area of RF design strategy, that may be incorporated into future industrial FEL systems for EUV lithography in order to minimize the necessary investment and operational costs. It goes on to try to assess the cost-benefit of an alternate RF design strategy, based upon previous studies.

Development of Ceramic Coating on Metal Substrate using Industrial Waste and Ore Minerals

NASA Astrophysics Data System (ADS)

Bhuyan, S. K.; Thiyagarajan, T. K.; Mishra, S. C.

2017-02-01

The technological advancement in modern era has a boon for enlightening human life; but also is a bane to produce a huge amount of (industrial) wastes, which is of great concern for utilization and not to create environmental threats viz. polution etc. In the present piece of research work, attempts have been made to utilize fly ash (wastes of thermal power plants) and along with alumina bearing ore i.e. bauxite, for developing plasma spray ceramic coatings on metals. Fly ash and with 10 and 20% bauxite addition is used to deposit plasma spray coatings on a metal substrate. The surface morphology of the coatings deposited at different power levels of plasma spraying investigated through SEM and EDS analysis. The coating thickness is measured. The porosity levels of the coatings are evaluated. The coating hardness isalso measured. This piece of research work will be beneficial for future development and use of industrial waste and ore minerals for high-valued applications.

A solid-state nuclear magnetic resonance study of post-plasma reactions in organosilicone microwave plasma-enhanced chemical vapor deposition (PECVD) coatings.

PubMed

Hall, Colin J; Ponnusamy, Thirunavukkarasu; Murphy, Peter J; Lindberg, Mats; Antzutkin, Oleg N; Griesser, Hans J

2014-06-11

Plasma-polymerized organosilicone coatings can be used to impart abrasion resistance and barrier properties to plastic substrates such as polycarbonate. Coating rates suitable for industrial-scale deposition, up to 100 nm/s, can be achieved through the use of microwave plasma-enhanced chemical vapor deposition (PECVD), with optimal process vapors such as tetramethyldisiloxane (TMDSO) and oxygen. However, it has been found that under certain deposition conditions, such coatings are subject to post-plasma changes; crazing or cracking can occur anytime from days to months after deposition. To understand the cause of the crazing and its dependence on processing plasma parameters, the effects of post-plasma reactions on the chemical bonding structure of coatings deposited with varying TMDSO-to-O2 ratios was studied with (29)Si and (13)C solid-state magic angle spinning nuclear magnetic resonance (MAS NMR) using both single-pulse and cross-polarization techniques. The coatings showed complex chemical compositions significantly altered from the parent monomer. (29)Si MAS NMR spectra revealed four main groups of resonance lines, which correspond to four siloxane moieties (i.e., mono (M), di (D), tri (T), and quaternary (Q)) and how they are bound to oxygen. Quantitative measurements showed that the ratio of TMDSO to oxygen could shift the chemical structure of the coating from 39% to 55% in Q-type bonds and from 28% to 16% for D-type bonds. Post-plasma reactions were found to produce changes in relative intensities of (29)Si resonance lines. The NMR data were complemented by Fourier transform infrared (FTIR) spectroscopy. Together, these techniques have shown that the bonding environment of Si is drastically altered by varying the TMDSO-to-O2 ratio during PECVD, and that post-plasma reactions increase the cross-link density of the silicon-oxygen network. It appears that Si-H and Si-OH chemical groups are the most susceptible to post-plasma reactions. Coatings produced at a low TMDSO-to-oxygen ratio had little to no singly substituted moieties, displayed a highly cross-linked structure, and showed less post-plasma reactions. However, these chemically more stable coatings are less compatible mechanically with plastic substrates, because of their high stiffness.

Electrostatic atomization--Experiment, theory and industrial applications

NASA Astrophysics Data System (ADS)

Okuda, H.; Kelly, Arnold J.

1996-05-01

Experimental and theoretical research has been initiated at the Princeton Plasma Physics Laboratory on the electrostatic atomization process in collaboration with Charged Injection Corporation. The goal of this collaboration is to set up a comprehensive research and development program on the electrostatic atomization at the Princeton Plasma Physics Laboratory so that both institutions can benefit from the collaboration. Experimental, theoretical and numerical simulation approaches are used for this purpose. An experiment consisting of a capillary sprayer combined with a quadrupole mass filter and a charge detector was installed at the Electrostatic Atomization Laboratory to study fundamental properties of the charged droplets such as the distribution of charges with respect to the droplet radius. In addition, a numerical simulation model is used to study interaction of beam electrons with atmospheric pressure water vapor, supporting an effort to develop an electrostatic water mist fire-fighting nozzle.

Design of a portable optical emission tomography system for microwave induced compact plasma for visible to near-infrared emission lines

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rathore, Kavita, E-mail: kavira@iitk.ac.in, E-mail: pmunshi@iitk.ac.in, E-mail: sudeepb@iitk.ac.in; Munshi, Prabhat, E-mail: kavira@iitk.ac.in, E-mail: pmunshi@iitk.ac.in, E-mail: sudeepb@iitk.ac.in; Bhattacharjee, Sudeep, E-mail: kavira@iitk.ac.in, E-mail: pmunshi@iitk.ac.in, E-mail: sudeepb@iitk.ac.in

A new non-invasive diagnostic system is developed for Microwave Induced Plasma (MIP) to reconstruct tomographic images of a 2D emission profile. A compact MIP system has wide application in industry as well as research application such as thrusters for space propulsion, high current ion beams, and creation of negative ions for heating of fusion plasma. Emission profile depends on two crucial parameters, namely, the electron temperature and density (over the entire spatial extent) of the plasma system. Emission tomography provides basic understanding of plasmas and it is very useful to monitor internal structure of plasma phenomena without disturbing its actualmore » processes. This paper presents development of a compact, modular, and versatile Optical Emission Tomography (OET) tool for a cylindrical, magnetically confined MIP system. It has eight slit-hole cameras and each consisting of a complementary metal–oxide–semiconductor linear image sensor for light detection. The optical noise is reduced by using aspheric lens and interference band-pass filters in each camera. The entire cylindrical plasma can be scanned with automated sliding ring mechanism arranged in fan-beam data collection geometry. The design of the camera includes a unique possibility to incorporate different filters to get the particular wavelength light from the plasma. This OET system includes selected band-pass filters for particular argon emission 750 nm, 772 nm, and 811 nm lines and hydrogen emission H{sub α} (656 nm) and H{sub β} (486 nm) lines. Convolution back projection algorithm is used to obtain the tomographic images of plasma emission line. The paper mainly focuses on (a) design of OET system in detail and (b) study of emission profile for 750 nm argon emission lines to validate the system design.« less

Fusion plasma theory project summaries

NASA Astrophysics Data System (ADS)

1993-10-01

This Project Summary book is a published compilation consisting of short descriptions of each project supported by the Fusion Plasma Theory and Computing Group of the Advanced Physics and Technology Division of the Department of Energy, Office of Fusion Energy. The summaries contained in this volume were written by the individual contractors with minimal editing by the Office of Fusion Energy. Previous summaries were published in February of 1982 and December of 1987. The Plasma Theory program is responsible for the development of concepts and models that describe and predict the behavior of a magnetically confined plasma. Emphasis is given to the modelling and understanding of the processes controlling transport of energy and particles in a toroidal plasma and supporting the design of the International Thermonuclear Experimental Reactor (ITER). A tokamak transport initiative was begun in 1989 to improve understanding of how energy and particles are lost from the plasma by mechanisms that transport them across field lines. The Plasma Theory program has actively participated in this initiative. Recently, increased attention has been given to issues of importance to the proposed Tokamak Physics Experiment (TPX). Particular attention has been paid to containment and thermalization of fast alpha particles produced in a burning fusion plasma as well as control of sawteeth, current drive, impurity control, and design of improved auxiliary heating. In addition, general models of plasma behavior are developed from physics features common to different confinement geometries. This work uses both analytical and numerical techniques. The Fusion Theory program supports research projects at U.S. government laboratories, universities and industrial contractors. Its support of theoretical work at universities contributes to the office of Fusion Energy mission of training scientific manpower for the U.S. Fusion Energy Program.

Overview of atomic layer etching in the semiconductor industry

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kanarik, Keren J., E-mail: keren.kanarik@lamresearch.com; Lill, Thorsten; Hudson, Eric A.

2015-03-15

Atomic layer etching (ALE) is a technique for removing thin layers of material using sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for more than 25 years. Today, it is being driven by the semiconductor industry as an alternative to continuous etching and is viewed as an essential counterpart to atomic layer deposition. As we enter the era of atomic-scale dimensions, there is need to unify the ALE field through increased effectiveness of collaboration between academia and industry, and to help enable the transition from lab to fab. With this in mind, this article providesmore » defining criteria for ALE, along with clarification of some of the terminology and assumptions of this field. To increase understanding of the process, the mechanistic understanding is described for the silicon ALE case study, including the advantages of plasma-assisted processing. A historical overview spanning more than 25 years is provided for silicon, as well as ALE studies on oxides, III–V compounds, and other materials. Together, these processes encompass a variety of implementations, all following the same ALE principles. While the focus is on directional etching, isotropic ALE is also included. As part of this review, the authors also address the role of power pulsing as a predecessor to ALE and examine the outlook of ALE in the manufacturing of advanced semiconductor devices.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fincke, J.R.; Swank, W.D.; Haggard, D.C.

This paper describes the experimental demonstration of a process for the direct plasma reduction of depleted uranium hexafluoride to uranium metal. The process exploits the large departures from equilibrium that can be achieved in the rapid supersonic expansion of a totally dissociated and partially ionized mixture of UF{sub 6}, Ar, He, and H{sub 2}. The process is based on the rapid condensation of subcooled uranium vapor and the relatively slow rate of back reaction between metallic uranium and HF to F{sub 2} to reform stable fluorides. The high translational velocities and rapid cooling result in an overpopulation of atomic hydrogenmore » which persists throughout the expansion process. Atomic hydrogen shifts the equilibrium composition by inhibiting the reformation of uranium-fluorine compounds. This process has the potential to reduce the cost of reducing UF{sub 6} to uranium metal with the added benefit of being a virtually waste free process. The dry HF produced is a commodity which has industrial value.« less

New developments in surface technology and prototyping

NASA Astrophysics Data System (ADS)

Himmer, Thomas; Beyer, Eckhard

2003-03-01

Novel lightweight applications in the automotive and aircraft industries require advanced materials and techniques for surface protection as well as direct and rapid manufacturing of the related components and tools. The manufacturing processes presented in this paper are based on multiple additive and subtractive technologies such as laser cutting, laser welding, direct laser metal deposition, laser/plasma hybrid spraying technique or CNC milling. The process chain is similar to layer-based Rapid Prototyping Techniques. In the first step, the 3D CAD geometry is sliced into layers by a specially developed software. These slices are cut by high speed laser cutting and then joined together. In this way laminated tools or parts are built. To improve surface quality and to increase wear resistance a CNC machining center is used. The system consists of a CNC milling machine, in which a 3 kW Nd:YAG laser, a coaxial powder nozzle and a digitizing system are integrated. Using a new laser/plasma hybrid spraying technique, coatings can be deposited onto parts for surface protection. The layers show a low porosity and high adhesion strength, the thickness is up to 0.3 mm, and the lower effort for preliminary surface preparation reduces time and costs of the whole process.

Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H{sub 2} and H{sub 2}-N{sub 2} plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cunge, G., E-mail: gilles.cunge@cea.fr; Petit-Etienne, C.; Davydova, A.

Graphene is the first engineering electronic material, which is purely two-dimensional: it consists of two exposed sp{sup 2}-hybridized carbon surfaces and has no bulk. Therefore, surface effects such as contamination by adsorbed polymer residues have a critical influence on its electrical properties and can drastically hamper its widespread use in devices fabrication. These contaminants, originating from mandatory technological processes of graphene synthesis and transfer, also impact fundamental studies of the electronic and structural properties at the atomic scale. Therefore, graphene-based technology and research requires “soft” and selective surface cleaning techniques dedicated to limit or to suppress this surface contamination. Here,more » we show that a high-density H{sub 2} and H{sub 2}-N{sub 2} plasmas can be used to selectively remove polymeric residues from monolayer graphene without any damage on the graphene surface. The efficiency of this dry-cleaning process is evidenced unambiguously by a set of spectroscopic and microscopic methods, providing unprecedented insights on the cleaning mechanisms and highlighting the role of specific poly-methyl-methacrylate residues at the graphene interface. The plasma is shown to perform much better cleaning than solvents and has the advantage to be an industrially mature technology adapted to large area substrates. The process is transferable to other kinds of two-dimensional material and heterostructures.« less

Is actinometry reliable for monitoring Si and silicone halides produced in silicon etching plasmas? A comparison with their absolute densities measured by UV broad band absorption

NASA Astrophysics Data System (ADS)

Kogelschatz, M.; Cunge, G.; Sadeghi, N.

2006-03-01

SiCl{x} radicals, the silicon etching by-products, are playing a major role in silicon gate etching processes because their redeposition on the wafer leads to the formation of a SiOCl{x} passivation layer on the feature sidewalls, which controls the final shape of the etching profile. These radicals are also the precursors to the formation of a similar layer on the reactor walls, leading to process drifts. As a result, the understanding and modelling of these processes rely on the knowledge of their densities in the plasma. Actinometry technique, based on optical emission, is often used to measure relative variations of the density of the above mentioned radicals, even if it is well known that the results obtained with this technique might not always be reliable. To determine the validity domain of actinometry in industrial silicon-etching high density plasmas, we measure the RF source power and pressure dependences of the absolute densities of SiCl{x} (x=0{-}2), SiF and SiBr radicals, deduced from UV broad band absorption spectroscopy. These results are compared to the evolution of the corresponding actinometry signals from these radicals. It is shown that actinometry predicts the global trends of the species density variations when the RF power is changed at constant pressure (that is to say when only the electron density changes) but it completely fails if the gas pressure, hence the electron temperature, changes.

New Weapons to Fight Old Enemies: Novel Strategies for the (Bio)control of Bacterial Biofilms in the Food Industry.

PubMed

Coughlan, Laura M; Cotter, Paul D; Hill, Colin; Alvarez-Ordóñez, Avelino

2016-01-01

Biofilms are microbial communities characterized by their adhesion to solid surfaces and the production of a matrix of exopolymeric substances, consisting of polysaccharides, proteins, DNA and lipids, which surround the microorganisms lending structural integrity and a unique biochemical profile to the biofilm. Biofilm formation enhances the ability of the producer/s to persist in a given environment. Pathogenic and spoilage bacterial species capable of forming biofilms are a significant problem for the healthcare and food industries, as their biofilm-forming ability protects them from common cleaning processes and allows them to remain in the environment post-sanitation. In the food industry, persistent bacteria colonize the inside of mixing tanks, vats and tubing, compromising food safety and quality. Strategies to overcome bacterial persistence through inhibition of biofilm formation or removal of mature biofilms are therefore necessary. Current biofilm control strategies employed in the food industry (cleaning and disinfection, material selection and surface preconditioning, plasma treatment, ultrasonication, etc.), although effective to a certain point, fall short of biofilm control. Efforts have been explored, mainly with a view to their application in pharmaceutical and healthcare settings, which focus on targeting molecular determinants regulating biofilm formation. Their application to the food industry would greatly aid efforts to eradicate undesirable bacteria from food processing environments and, ultimately, from food products. These approaches, in contrast to bactericidal approaches, exert less selective pressure which in turn would reduce the likelihood of resistance development. A particularly interesting strategy targets quorum sensing systems, which regulate gene expression in response to fluctuations in cell-population density governing essential cellular processes including biofilm formation. This review article discusses the problems associated with bacterial biofilms in the food industry and summarizes the recent strategies explored to inhibit biofilm formation, with special focus on those targeting quorum sensing.

New Weapons to Fight Old Enemies: Novel Strategies for the (Bio)control of Bacterial Biofilms in the Food Industry

PubMed Central

Coughlan, Laura M.; Cotter, Paul D.; Hill, Colin; Alvarez-Ordóñez, Avelino

2016-01-01

Biofilms are microbial communities characterized by their adhesion to solid surfaces and the production of a matrix of exopolymeric substances, consisting of polysaccharides, proteins, DNA and lipids, which surround the microorganisms lending structural integrity and a unique biochemical profile to the biofilm. Biofilm formation enhances the ability of the producer/s to persist in a given environment. Pathogenic and spoilage bacterial species capable of forming biofilms are a significant problem for the healthcare and food industries, as their biofilm-forming ability protects them from common cleaning processes and allows them to remain in the environment post-sanitation. In the food industry, persistent bacteria colonize the inside of mixing tanks, vats and tubing, compromising food safety and quality. Strategies to overcome bacterial persistence through inhibition of biofilm formation or removal of mature biofilms are therefore necessary. Current biofilm control strategies employed in the food industry (cleaning and disinfection, material selection and surface preconditioning, plasma treatment, ultrasonication, etc.), although effective to a certain point, fall short of biofilm control. Efforts have been explored, mainly with a view to their application in pharmaceutical and healthcare settings, which focus on targeting molecular determinants regulating biofilm formation. Their application to the food industry would greatly aid efforts to eradicate undesirable bacteria from food processing environments and, ultimately, from food products. These approaches, in contrast to bactericidal approaches, exert less selective pressure which in turn would reduce the likelihood of resistance development. A particularly interesting strategy targets quorum sensing systems, which regulate gene expression in response to fluctuations in cell-population density governing essential cellular processes including biofilm formation. This review article discusses the problems associated with bacterial biofilms in the food industry and summarizes the recent strategies explored to inhibit biofilm formation, with special focus on those targeting quorum sensing. PMID:27803696

Study of effective utilization of iron ore sinter through arc plasma

NASA Astrophysics Data System (ADS)

Swain, Biswajit; Samal, S. K.; Mohanty, M. K.; Behera, A.; Mishra, S. C.

2018-03-01

Generation of fines is common in mining, sizing, and beneficiation and also in high-temperature metallurgical processes as the disintegration of agglomerate/compact occurs. Extraction of metallic iron from ore fines is one of the challenging aspects of iron making industries as the liberation of fines blocks, the charge burden porosity and hence hinders the reduction rate. Along with size factor, mineral composition plays a vital role in the extraction process; particularly silica. As silica has the very high tendency towards iron oxide, at comparatively low temperature, the activity of silica should be suppressed to prevent silicate phases. Adjustment of such conditions is controlled by addition of lime, but sometimes excessive slag generation increases the cost of production. In the present work, carbothermic reduction of partially reduced iron bearing pellets has been melted through 20 KW DC arc plasma furnace, and a comparative study has been made for considering different slag chemistry approaches. Pellets as aforementioned are made available from Patnaik Steel and Alloys Ltd, Odisha, having high silica content ore fines (of about 8.6%) as obtained from the chemical analysis. X-Ray analysis and optical image analyzer result of sinter thus obtained reveal that fayalite phase has major fractional value. Smelting works were done for sinter with/without adjustment of slag chemistry, where argon and nitrogen were used as plasma forming gases. A range of recovery rates (between 87-94%) is achieved by charge composition, ionizing gases, and smelting duration. It is observed that use of nitrogen as plasma forming gas increases the recovery rate than that of using only argon plasma; due to high energy flux of nitrogen which increases the enthalpy due to its diatomicity. A maximum recovery rate of about 94% is achieved for process duration of 13minutes utilizing nitrogen plasma. Smelting of charge with the addition of hydrated lime targeting melilite as final slag resulted in the formation of metallic iron as confirmed from XRD and XRF analyses. In the other hand, ferrosilicon is liberated in the metallic parts where smelting of charge was done without adjustment of slag chemistry. Both metal and slag thus obtained are characterized by XRD, XRF, microhardness and wet chemical analysis suitably.

Resolving critical dimension drift over time in plasma etching through virtual metrology based wafer-to-wafer control

NASA Astrophysics Data System (ADS)

Lee, Ho Ki; Baek, Kye Hyun; Shin, Kyoungsub

2017-06-01

As semiconductor devices are scaled down to sub-20 nm, process window of plasma etching gets extremely small so that process drift or shift becomes more significant. This study addresses one of typical process drift issues caused by consumable parts erosion over time and provides feasible solution by using virtual metrology (VM) based wafer-to-wafer control. Since erosion of a shower head has center-to-edge area dependency, critical dimensions (CDs) at the wafer center and edge area get reversed over time. That CD trend is successfully estimated on a wafer-to-wafer basis by a partial least square (PLS) model which combines variables from optical emission spectroscopy (OES), VI-probe and equipment state gauges. R 2 of the PLS model reaches 0.89 and its prediction performance is confirmed in a mass production line. As a result, the model can be exploited as a VM for wafer-to-wafer control. With the VM, advanced process control (APC) strategy is implemented to solve the CD drift. Three σ of CD across wafer is improved from the range (1.3-2.9 nm) to the range (0.79-1.7 nm). Hopefully, results introduced in this paper will contribute to accelerating implementation of VM based APC strategy in semiconductor industry.

Sulfide Stress Cracking and Electrochemical Corrosion of Precipitation Hardening Steel After Plasma Oxy-Nitriding

NASA Astrophysics Data System (ADS)

Granda-Gutiérrez, E. E.; Díaz-Guillén, J. C.; Díaz-Guillén, J. A.; González, M. A.; García-Vázquez, F.; Muñóz, R.

2014-11-01

In this paper, we present the results of a duplex plasma nitriding followed by an oxidizing stage process (which is also referred as oxy-nitriding) on the corrosion behavior of a 17-4PH precipitation hardening stainless steel. The formation of both, expanded martensite (b.c.t. α'N-phase) and chromium oxide (type Cr2O3) in the subsurface of oxy-nitrided samples at specific controlled conditions, leads in a noticeable increasing in the time-to-rupture during the sulfide stress cracking test, in comparison with an untreated reference sample. Oxy-nitriding improves the corrosion performance of the alloy when it is immersed in solutions saturated by sour gas, which extends the application potential of this type of steel in the oil and gas extraction and processing industry. The presence of the oxy-nitrided layer inhibits the corrosion process that occurs in the near-surface region, where hydrogen is liberated after the formation of iron sulfides, which finally produces a fragile fracture by micro-crack propagation; the obtained results suggest that oxy-nitriding slows this process, thus delaying the rupture of the specimen. Moreover, oxy-nitriding produces a hard, sour gas-resistant surface, but do not significantly affect the original chloride ion solution resistance of the material.

Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes.

PubMed

Yoo, Seunghwan; Song, Ho Young; Lee, Junghoon; Jang, Cheol-Yong; Jeong, Hakgeun

2012-11-20

In this article, we introduce a simple fabrication method for SiO(2)-based thin diffractive optical elements (DOEs) that uses the conventional processes widely used in the semiconductor industry. Photolithography and an inductively coupled plasma etching technique are easy and cost-effective methods for fabricating subnanometer-scale and thin DOEs with a refractive index of 1.45, based on SiO(2). After fabricating DOEs, we confirmed the shape of the output light emitted from the laser diode light source and applied to a light-emitting diode (LED) module. The results represent a new approach to mass-produce DOEs and realize a high-brightness LED module.

A Plasma Window for Transmission of Radiation and Particle Beams from Vacuum to Atmosphere for Various Applications

NASA Astrophysics Data System (ADS)

Hershcovitch, Ady

1997-11-01

Many industrial and scientific processes like electron beam melting and welding, material modification by ion implantation, dry etching, and micro-fabrication, as well as generation of synchrotron radiation are performed almost exclusively in vacuum nowadays, since the electron and ion guns and their extractors must be kept at a reasonably high vacuum. Consequently, there are numerous drawbacks, among which are low production rates due to required pumping time, limits the vacuum volume sets on the size of target objects. In a small number of applications like non-vacuum electron beam welding, and various processes involving UV and x-ray radiation, thin vacuum walls or long stages of differential pumping are used. But, the resultant degradations of particle and radiation beams severely limit those applications. A novel apparatus, which utilized a short plasma arc, was successfully used to maintain a pressure of 7.6 x exp(-6) Torr in a vacuum chamber with a 2.36mm aperture to atmosphere, i.e., a plasma was successfully used to "plug" a hole to atmosphere while maintaining a reasonably high vacuum in the chamber. Successful transmission of charged particle beams from a vacuum through the plasma to atmosphere was accomplished. More details can be found in A. Hershcovitch, J. Appl. Physics 78, p. 5283 (1995). In addition to sustaining a vacuum atmosphere interface, the plasma has very strong lensing effect on charged particles. The plasma current generates an azimuthal magnetic field which exerts a radial Lorentz on charged particles moving parallel to the current channel. With proper orientation of the current direction, the Lorentz force is radially inward. This feature can be used to focus in beams to a very small spot size, and to overcome beam dispersion due to scattering by atmospheric atoms and molecules. Relatively hot plasma at the atmosphere boundary rarefies the atmospheric gases to further enhance particle beam propagation to the materials to target. Recent experimental results, with a plasma window coupled to a venturi, show a factor of three further enhancement in vacuum-atmosphere separation.

Method & apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Ward, Pamela Denise; Stevenson, Joel O'Don

2004-10-19

The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.

Design, modeling, and diagnostics of microplasma generation at microwave frequency

NASA Astrophysics Data System (ADS)

Miura, Naoto

Plasmas are partially ionized gases that find wide utility in the processing of materials, especially in integrated circuit fabrication. Most industrial applications of plasma occur in near-vacuum where the electrons are hot (>10,000 K) but the gas remains near room temperature. Typical atmospheric plasmas, such as arcs, are hot and destructive to sensitive materials. Recently the emerging field of microplasmas has demonstrated that atmospheric ionization of cold gases is possible if the plasma is microscopic. This dissertation investigates the fundamental physical properties of two classes of microplasma, both driven by microwave electric fields. The extension of point-source microplasmas into a line-shaped plasma is also described. The line-shape plasma is important for atmospheric processing of materials using roll-coating. Microplasma generators driven near 1 GHz were designed using microstrip transmission lines and characterized using argon near atmospheric pressure. The electrical characteristics of the microplasma including the discharge voltage, current and resistance were estimated by comparing the experimental power reflection coefficient to that of an electromagnetic simulation. The gas temperature, argon metastable density and electron density were obtained by optical absorption and emission spectroscopy. The microscopic internal plasma structure was probed using spatially-resolved diode laser absorption spectroscopy of excited argon states. The spatially resolved diagnostics revealed that argon metastable atoms were depleted within the 200mum core of the microplasma where the electron density was maximum. Two microplasma generators, the split-ring resonator (SRR) and the transmission line (T-line) generator, were compared. The SRR ran efficiently with a high impedance plasma (>1000 O) and was stabilized by the self-limiting of absorbed power (<1W) as a lower impedance plasma caused an impedance mismatch. Gas temperatures were <1000 K and electron densities were ~1020 m-3, conditions which are favorable for treatment of delicate materials. The T-line generator ran most efficiently with an intense, low impedance plasma that matched the impedance of the T-line (35 O). With the T-line generator, the absorbed power could exceed 20W, which created an electron density of 1021 m-3, but the gas temperature exceeded 2000 K. Finally, line-shaped microplasmas based on resonant and non-resonant configurations were developed, tested, and analyzed.

High strength nanostructured Al-based alloys through optimized processing of rapidly quenched amorphous precursors.

PubMed

Kim, Song-Yi; Lee, Gwang-Yeob; Park, Gyu-Hyeon; Kim, Hyeon-Ah; Lee, A-Young; Scudino, Sergio; Prashanth, Konda Gokuldoss; Kim, Do-Hyang; Eckert, Jürgen; Lee, Min-Ha

2018-01-18

We report the methods increasing both strength and ductility of aluminum alloys transformed from amorphous precursor. The mechanical properties of bulk samples produced by spark-plasma sintering (SPS) of amorphous Al-Ni-Co-Dy powders at temperatures above 673 K are significantly enhanced by in-situ crystallization of nano-scale intermetallic compounds during the SPS process. The spark plasma sintered Al 84 Ni 7 Co 3 Dy 6 bulk specimens exhibit 1433 MPa compressive yield strength and 1773 MPa maximum strength together with 5.6% plastic strain, respectively. The addition of Dy enhances the thermal stability of primary fcc Al in the amorphous Al-TM -RE alloy. The precipitation of intermetallic phases by crystallization of the remaining amorphous matrix plays important role to restrict the growth of the fcc Al phase and contributes to the improvement of the mechanical properties. Such fully crystalline nano- or ultrafine-scale Al-Ni-Co-Dy systems are considered promising for industrial application because their superior mechanical properties in terms of a combination of very high room temperature strength combined with good ductility.

NASA Astrophysics Data System (ADS)

Sampath, S.; Wayne, S. F.

1994-09-01

Thermally sprayed molybdenum coatings are used in a variety of industrial applications, such as auto-motive piston rings, aeroturbine engines, and paper and plastics processing machinery. Molybdenum ex-hibits excellent scuffing resistance under sliding contact conditions. However, plasma-sprayed molybde-num coatings are relatively soft and require dispersion strengthening (e.g., Mo2C) or addition of a second phase (e.g., NiCrBSi) to improve hardness, wear resistance, and thus coating performance. In this study, Mo-Mo2C composite powders were plasma sprayed onto mild steel substrates. Considerable decarburi-zation was observed during air plasma spraying—a beneficial condition because carbon acts as a sacrifi-cial getter for the oxygen, thereby reducing the oxide content in the coating. Finer powders showed a greater degree of decarburization due to the increased surface area; however, the starting carbide con-tent in the powder exerted very little influence on the extent of decarburization. The friction properties of Mo-Mo2C coatings were significantly improved compared to those of pure molybdenum under con-tinuous sliding contact conditions. It also was found that the abrasion resistance of the coatings improved with increasing carbide addition.

Application of External Axis in Robot-Assisted Thermal Spraying

NASA Astrophysics Data System (ADS)

Deng, Sihao; Fang, Dandan; Cai, Zhenhua; Liao, Hanlin; Montavon, Ghislain

2012-12-01

Currently, industrial robots are widely used in the process of thermal spraying because of their high efficiency, security, and repeatability. Although robots are found suitable for use in industrial productions, they have some natural disadvantages because of their six-axis mechanical linkages. When a robot performs a series of stages of production, it could be hard to move from one to another because a few axes reach their limit value. For this reason, an external axis should be added to the robot system to extend the reachable space of the robots. This article concerns the application of external axis on ABB robots in thermal spraying and the different methods of off-line programming with external axis in the virtual environment. The developed software toolkit was applied to coat real workpiece with a complex geometry in atmospheric plasma spraying).

Expert system and process optimization techniques for real-time monitoring and control of plasma processes

NASA Astrophysics Data System (ADS)

Cheng, Jie; Qian, Zhaogang; Irani, Keki B.; Etemad, Hossein; Elta, Michael E.

1991-03-01

To meet the ever-increasing demand of the rapidly-growing semiconductor manufacturing industry it is critical to have a comprehensive methodology integrating techniques for process optimization real-time monitoring and adaptive process control. To this end we have accomplished an integrated knowledge-based approach combining latest expert system technology machine learning method and traditional statistical process control (SPC) techniques. This knowledge-based approach is advantageous in that it makes it possible for the task of process optimization and adaptive control to be performed consistently and predictably. Furthermore this approach can be used to construct high-level and qualitative description of processes and thus make the process behavior easy to monitor predict and control. Two software packages RIST (Rule Induction and Statistical Testing) and KARSM (Knowledge Acquisition from Response Surface Methodology) have been developed and incorporated with two commercially available packages G2 (real-time expert system) and ULTRAMAX (a tool for sequential process optimization).

Open Air Silicon Deposition by Atmospheric Pressure Plasma under Local Ambient Gas Control

NASA Astrophysics Data System (ADS)

Naito, Teruki; Konno, Nobuaki; Yoshida, Yukihisa

2015-09-01

In this paper, we report open air silicon (Si) deposition by combining a silane free Si deposition technology and a newly developed local ambient gas control technology. Recently, material processing in open air has been investigated intensively. While a variety of materials have been deposited, there were only few reports on Si deposition due to the susceptibility to contamination and the hazardous nature of source materials. Since Si deposition is one of the most important processes in device fabrication, we have developed open air silicon deposition technologies in BEANS project. For a clean and safe process, a local ambient gas control head was designed. Process gas leakage was prevented by local evacuation, and air contamination was shut out by inert curtain gas. By numerical and experimental investigations, a safe and clean process condition with air contamination less than 10 ppm was achieved. Si film was deposited in open air by atmospheric pressure plasma enhanced chemical transport under the local ambient gas control. The film was microcrystalline Si with the crystallite size of 17 nm, and the Hall mobility was 2.3 cm2/V .s. These properties were comparable to those of Si films deposited in a vacuum chamber. This research has been conducted as one of the research items of New Energy and Industrial Technology Development Organization ``BEANS'' project.

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella biofilms.

PubMed

Niemira, Brendan A; Boyd, Glenn; Sites, Joseph

2014-05-01

Cross-contamination of foods from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a rapid, waterless, zero-contact, chemical-free method for removing pathogens from food contact surfaces. Cold plasma was tested for its ability to inactivate Salmonella biofilms. A 3-strain Salmonella culture was grown to form adherent biofilms for 24, 48, or 72 h on a test surface (glass slides). These were placed on a conveyor belt and passed at various line speeds to provide exposure times of 5, 10, or 15 s. The test plate was either 5 or 7.5 cm under a plasma jet emitter operating at 1 atm using filtered air as the feed gas. The frequency of high-voltage electricity was varied from 23 to 48 kHz. At the closer spacing (5 cm), cold plasma reduced Salmonella biofilms by up to 1.57 log CFU/mL (5 s), 1.82 log CFU/mL (10 s), and 2.13 log CFU/mL (15 s). Increasing the distance to 7.5 cm generally reduced the efficacy of the 15 s treatment, but had variable effects on the 5 and 10 s treatments. Variation of the high-voltage electricity had a greater effect on 10 and 15 s treatments, particularly at the 7.5 cm spacing. For each combination of time, distance, and frequency, Salmonella biofilms of 24, 48, and 72 h growth responded consistently with each other. The results show that short treatments with cold plasma yielded up to a 2.13 log reduction of a durable form of Salmonella contamination on a model food contact surface. This technology shows promise as a possible tool for rapid disinfection of materials associated with food processing. Pathogens such as Salmonella can form chemical-resistant biofilms, making them difficult to remove from food contact surfaces. A 15 s treatment with cold plasma reduced mature Salmonella biofilms by up to 2.13 log CFU/mL (99.3%). This contact-free, waterless method uses no chemical sanitizers. Cold plasma may therefore have a practical application for conveyor belts, equipment, and other food contact surfaces where a rapid, dry antimicrobial process is required. © 2014 Institute of Food Technologists®

Application of laser driven fast high density plasma blocks for ion implantation

NASA Astrophysics Data System (ADS)

Sari, Amir H.; Osman, F.; Doolan, K. R.; Ghoranneviss, M.; Hora, H.; Höpfl, R.; Benstetter, G.; Hantehzadeh, M. H.

2005-10-01

The measurement of very narrow high density plasma blocks of high ion energy from targets irradiated with ps-TW laser pulses based on a new skin depth interaction process is an ideal tool for application of ion implantation in materials, especially of silicon, GaAs, or conducting polymers, for micro-electronics as well as for low cost solar cells. A further application is for ion sources in accelerators with most specifications of many orders of magnitudes advances against classical ion sources. We report on near band gap generation of defects by implantation of ions as measured by optical absorption spectra. A further connection is given for studying the particle beam transforming of n-type semiconductors into p-type and vice versa as known from sub-threshold particle beams. The advantage consists in the use of avoiding aggressive or rare chemical materials when using the beam techniques for industrial applications.

Reproducibility of the cutoff probe for the measurement of electron density

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kim, D. W.; Oh, W. Y.; You, S. J., E-mail: sjyou@cnu.ac.kr

2016-06-15

Since a plasma processing control based on plasma diagnostics attracted considerable attention in industry, the reproducibility of the diagnostics using in this application has become a great interest. Because the cutoff probe is one of the potential candidates for this application, knowing the reproducibility of the cutoff probe measurement becomes quit important in the cutoff probe application research. To test the reproducibility of the cutoff probe measurement, in this paper, a comparative study among the different cutoff probe measurements was performed. The comparative study revealed remarkable result: the cutoff probe has a great reproducibility for the electron density measurement, i.e.,more » there are little differences among measurements by different probes made by different experimenters. The discussion including the reason for the result was addressed via this paper by using a basic measurement principle of cutoff probe and a comparative experiment with Langmuir probe.« less

The flavonoid paradox: conjugation and deconjugation as key steps for the biological activity of flavonoids.

PubMed

Perez-Vizcaino, Francisco; Duarte, Juan; Santos-Buelga, Celestino

2012-07-01

Flavonoids have been proposed to exert beneficial effects in the prevention of a large number of diseases, including cancer, cardiovascular disease, and neurodegenerative disorders. Paradoxically, despite the most representative flavonoid--quercetin--exerting biologically demonstrable systemic effects, it is not found in plasma after oral administration and its circulating metabolites show weak activity in vitro. The current available evidence indicates that quercetin is extensively metabolized into methylated and glucurono- and sulfo-conjugated metabolites, which are the plasma circulating forms; and glucurono-, but not sulfo-conjugates, can be hydrolyzed at the vascular level, yielding the parent aglycone which accumulates in tissues. Thus conjugation is a reversible process and, at least regarding the vasodilator and antihypertensive effects, the conjugation-deconjugation cycle appears to be an absolute requirement. Glucuronidated derivatives transport quercetin and its methylated form, and deliver to the tissues the free aglycone, which is the final effector. Copyright © 2012 Society of Chemical Industry.

PREFACE: International Conference on Fundamentals and Applications of HIPIMS

NASA Astrophysics Data System (ADS)

Ehiasarian, Arutiun; Bandorf, Ralf

2012-09-01

Thin film technology and surface engineering are nowadays key components for numerous innovative products like efficient windows, flat screens, sensors or hard coatings used in tool coating and automotive applications, as well as products for everyday life. In line with the demands of surface technology, coating technology is also evolving and improving. The latest major technology jump was the introduction of pulse technology in physical vapor deposition. High power impulse magnetron sputtering is the most recent development of pulse sputtering. After approximately a decade of intense academic investigation and development we observe today a transfer of this new technology towards industrial processes. As well as several international activities the international conference on fundamentals and applications of HIPIMS continues the success story of the HIPIMS days, initiated in 2004 at Sheffield Hallam University, UK. Becoming the only international conference especially dedicated to HIPIMS the HIPIMS conference is a venue for industrial and academic exchange on the latest developments in this fast evolving new technology. As a joint undertaking of Sheffield Hallam University SHU, Network of Competence for Industrial Plasma Surface Technology INPLAS and Fraunhofer Institute for Surface Engineering and Thin Films IST the HIPIMS conference was launched in 2010 in Sheffield, UK. With 120 delegates the impact of the new conference was underlined. The growing importance of HIPIMS technology was connected with a growth by nearly 35% to 160 participants in 2011 at the second HIPIMS conference in Braunschweig, DE. The participants were made up of equal numbers from research and development (university and research institutes) and industry. Being a global conference representatives from 25 different countries from all continents attended. The HIPIMS conference is also in joint collaboration with the COST Action MP0804 Highly Ionized Pulse Plasma Processes (www.hipp-cost.eu). COST (European Cooperation in Science and Technology) is one of the longest-running European frameworks supporting cooperation among scientists and researchers across Europe (www.cost.eu). The COST Action MP0804 HIPP processes focuses on the fundamentals and the industrial implementation of highly ionized pulse plasmas, where HIPIMS is the most prominent and most mature technology, today. Over 50 high level contributions, divided in 37 oral and 14 poster presentations were highly appreciated by the professional audience. The message from 2011 was that HIPIMS technology has now reached industry. In the opening session of the conference representatives from different companies reported on the latest developments in industrialization. Using HIPIMS technology, the lifetime of mills using a state of the art coating can be extended by 50%. Comparable deposition rates for coating cutting inserts on the different faces are reported. The ice-free window for automotive application is one solution just becoming available by HIPIMS technology. The talks from international experts covered a range from fundamental physics, experimental investigations, theoretically modeling to several applications and made the international conference on fundamentals and applications a success story to be continued in the following years. Arutiun Ehiasarian and Ralf Bandorf (Conference Chairmen of HIPIMS 2010 and 2011, respectively) Organising Committee (2010 and 2011) - Affiliations Professor Dr Papken Hovsepian (Sheffield Hallam University, Nanotechnology Center for PVD Research, UK) Professor Dr Günter Bräuer (Fraunhofer Institute for Surface Engineering and Thin Films IST/ Network of Competence INPLAS, Braunschweig, DE) Professor Dr Arutiun P. Ehiasarian (Sheffield Hallam University, Materials Research Institute, UK) Dr Ralf Bandorf (Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, DE) Main Sponsor Society of Vacuum Coaters SVC Albuquerque, New Mexico, USA Sponsors Ionbond Netherlands BV Venlo, NL Hauzer Techno Coating BV Venlo, NL Hüttinger Elektronik GmbH + Co. KG Freiburg, DE Conference Photos Conference photograph Attendees HIPIMS Conference 2010, Sheffield, UK Conference photograph Attendees HIPIMS Conference 2011, Braunschweig, Germany

PREFACE Preface

NASA Astrophysics Data System (ADS)

Degrez, Gérard; van der Mullen, Joost

2011-01-01

It is with pleasure and pride that we present the selected contributions from participants of the 11th High-Tech Plasma Processes conference. This conference, which took place in Brussels from June 28 to July 2 2010, is based on a European forum with a history of more than twenty years. The conference series started as a thermal plasma conference and gradually expanded to include other topics and fields as well. HTPP 11 was organized in collaboration with the Belgian Interuniversity Attraction Pole (IAP): Physical chemistry of Plasma-surface Interactions (PSI-ψ). The program was devised by the plasma group of the Technische Universiteit Eindhoven in collaboration with the IAP, the Association Arc Electrique and the International Scientific Committee. The organization was guided by the Steering Committee and supervised by the two founding members, Jacques Amouroux and Pierre Fauchais. HTPP aims to bring together different scientific communities to facilitate contacts between science, technology and industry, providing a platform for the exploration of elementary processes in and by plasmas. This implies that, apart from fundamental topics, considerable attention is paid to new plasma applications; plasma engineering in Europe is one of the main driving forces behind HTPP. The conference supports the dissemination of methods for plasma diagnostics and monitoring and the exchange of models for plasmas sources and plasma applications. A novelty of HTPP 11 was the model market; a special type of poster session where running models were demonstrated and spectators were challenged to assemble their own plasma models using one of the available construction platforms. For the first time in this series of conferences, the proceedings are published in two companion issues: Journal of Physics D: Applied Physics, which presents a selection of papers including invited and keynote papers, and the Journal of Physics: Conference Series. The present volume of the Journal of Physics: Conference Series includes 21 papers devoted to various branches of plasma physics. In line with the objectives of the HTPP conference, you will find papers on plasma sources, diagnostics and theory, covering the fields of thermal and non-thermal (even cold) plasmas, plasma-electrode interactions, surface treatment, synthesis, light generation and transport, and on applications in the fields of environmental technologies, biochemistry, and aeronautical and space sciences. We would like to thank the members of the various committees, the participants who sent their contributions and the referees who did an excellent job giving support to improve the manuscripts. We greatly appreciate the financial support from the conference sponsors: Association Arc Electrique, Belspo (Belgian Science Policy), Fonds National de la Recherche Scientifique, Ocean Optics Inc., Technifutur - Pôle Génie Mécanique & Solvay S.A.. Gérard DegrezChairman of the Local Organizing Committee Joost van der MullenChairman of the Steering Committee

Mechanism and comparison of needle-type non-thermal direct and indirect atmospheric pressure plasma jets on the degradation of dyes

NASA Astrophysics Data System (ADS)

Attri, Pankaj; Yusupov, Maksudbek; Park, Ji Hoon; Lingamdinne, Lakshmi Prasanna; Koduru, Janardhan Reddy; Shiratani, Masaharu; Choi, Eun Ha; Bogaerts, Annemie

2016-10-01

Purified water supply for human use, agriculture and industry is the major global priority nowadays. The advanced oxidation process based on atmospheric pressure non-thermal plasma (NTP) has been used for purification of wastewater, although the underlying mechanisms of degradation of organic pollutants are still unknown. In this study we employ two needle-type atmospheric pressure non-thermal plasma jets, i.e., indirect (ID-APPJ) and direct (D-APPJ) jets operating at Ar feed gas, for the treatment of methylene blue, methyl orange and congo red dyes, for two different times (i.e., 20 min and 30 min). Specifically, we study the decolorization/degradation of all three dyes using the above mentioned plasma sources, by means of UV-Vis spectroscopy, HPLC and a density meter. We also employ mass spectroscopy to verify whether only decolorization or also degradation takes place after treatment of the dyes by the NTP jets. Additionally, we analyze the interaction of OH radicals with all three dyes using reactive molecular dynamics simulations, based on the density functional-tight binding method. This investigation represents the first report on the degradation of these three different dyes by two types of NTP setups, analyzed by various methods, and based on both experimental and computational studies.

Microgravity Production of Nanoparticles of Novel Materials Using Plasma Synthesis

NASA Technical Reports Server (NTRS)

Frenklach, Michael; Fernandez-Pello, Carlos

2001-01-01

The research goal is to study the formation in reduced gravity of high quality nanoparticulate of novel materials using plasma synthesis. Particular emphasis will be placed on the production of powders of non-oxide materials like diamond, SiC, SiN, c-BN, etc. The objective of the study is to investigate the effect of gravity on plasma synthesis of these materials, and to determine how the microgravity synthesis can improve the quality and yield of the nanoparticles. It is expected that the reduced gravity will aid in the understanding of the controlling mechanisms of plasma synthesis, and will increase the yield, and quality of the synthesized powder. These materials have properties of interest in several industrial applications, such as high temperature load bearings or high speed metal machining. Furthermore, because of the nano-meter size of the particulate produced in this process, they have specific application in the fabrication of MEMS based combustion systems, and in the development and growth of nano-systems and nano-structures of these materials. These are rapidly advancing research areas, and there is a great need for high quality nanoparticles of different materials. One of the primary systems of interest in the project will be gas-phase synthesis of nanopowder of non-oxide materials.

Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms.

PubMed

Franek, James; Brandt, Steven; Berger, Birk; Liese, Martin; Barthel, Matthias; Schüngel, Edmund; Schulze, Julian

2015-05-01

We present a novel radio-frequency (RF) power supply and impedance matching to drive technological plasmas with customized voltage waveforms. It is based on a system of phase-locked RF generators that output single frequency voltage waveforms corresponding to multiple consecutive harmonics of a fundamental frequency. These signals are matched individually and combined to drive a RF plasma. Electrical filters are used to prevent parasitic interactions between the matching branches. By adjusting the harmonics' phases and voltage amplitudes individually, any voltage waveform can be approximated as a customized finite Fourier series. This RF supply system is easily adaptable to any technological plasma for industrial applications and allows the commercial utilization of process optimization based on voltage waveform tailoring for the first time. Here, this system is tested on a capacitive discharge based on three consecutive harmonics of 13.56 MHz. According to the Electrical Asymmetry Effect, tuning the phases between the applied harmonics results in an electrical control of the DC self-bias and the mean ion energy at almost constant ion flux. A comparison with the reference case of an electrically asymmetric dual-frequency discharge reveals that the control range of the mean ion energy can be significantly enlarged by using more than two consecutive harmonics.

Experimental Investigation of Pulsed Nanosecond Streamer Discharges for CO2 Reforming

NASA Astrophysics Data System (ADS)

Pachuilo, Michael; Levko, Dima; Raja, Laxminarayan; Varghese, Philip

2016-09-01

Rapid global industrialization has led to an increase in atmospheric greenhouse gases, specifically carbon dioxide levels. Plasmas present a great potential for efficient reforming of greenhouse gases. There are several plasma discharges which have been reported for reforming process: dielectric barrier discharges (DBD), microwave discharges, and glide-arcs. Microwave discharges have CO2 conversion energy efficiency of up to 40% at atmospheric conditions, while glide-arcs have 43% and DBD 2-10%. In our study, we analyze a single nanosecond pulsed cathode directed streamer discharge in CO2 at atmospheric pressure and temperature. We have conducted time resolved imaging with spectral bandpass filters of a streamer discharge with an applied negative polarity pulse. The image sequences have been correlated to the applied voltage and current pulses. From the spectral filters we can determine where spatially and temporally excited species are formed. In this talk we report on spectroscopic studies of the discharge and estimate plasma properties such as temperature and density of excited species and electrons. Furthermore, we report on the effects of pulse polarity as well as anodic streamer discharges on the CO2 conversion efficiency. Finally, we will focus on the effects of vibrational excitation on carbon dioxide reforming efficiency for streamer discharges. Our experimental results will be compared with an accompanying plasma computational model studies.

Characterisations Of Al{sub 2}O{sub 3}-13% Wt TiO{sub 2} Deposition On Mild Steel Via Plasma Spray Method

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yusoff, N. H.; Isa, M. C.; Ghazali, M. J.

2011-01-17

To date, plasma sprayed alumina titania have been widely used as wear resistance coatings in textile, machinery and printing industries. Previous studies showed that the coating microstructures and properties were strongly depended on various parameters such as ceramic composition, grain size powders and spray parameters, thus, influencing the melting degree of the alumina titania during the deposition process. The aim of this study focuses on the evolution of the micron sizes of alumina-13%wt titania at different plasma spray power, ranging from 20kW to 40kW. It was noted that the coating porosity of alumina-13%wt titania were decreased from 6.2% to 4%more » by increasing the plasma power from 20 to 40 kW. At lower power value, partially melted powders were deposited, generating over 6% porosity within the microstructures. Percentage of porosity about 5.6% gave the best ratio of bi-modal structures, providing the highest microhardness value. Furthermore, the effect of microstructure and porosity formation on wear resistance was also discussed. Coatings with less porosity exhibited better resistance to wear, in which the wear resistance of coated mild steel possessed only {approx}5 x 10{sup -4} cm{sup 3}/Nm with 4% of porosity.« less

Comparison of Physical-chemical and Mechanical Properties of Chlorapatite and Hydroxyapatite Plasma Sprayed Coatings

PubMed Central

Demnati, Imane; Grossin, David; Marsan, Olivier; Bertrand, Ghislaine; Collonges, Gérard; Combes, Christèle; Parco, Maria; Braceras, Inigo; Alexis, Joel; Balcaen, Yannick; Rey, Christian

2015-01-01

Chlorapatite can be considered a potential biomaterial for orthopaedic applications. Its use as plasma-sprayed coating could be of interest considering its thermal properties and particularly its ability to melt without decomposition unlike hydroxyapatite. Chlorapatite (ClA) was synthesized by a high-temperature ion exchange reaction starting from commercial stoichiometric hydroxyapatites (HA). The ClA powder showed similar characteristics as the original industrial HA powder, and was obtained in the monoclinic form. The HA and ClA powders were plasma-sprayed using a low-energy plasma spraying system with identical processing parameters. The coatings were characterized by physical-chemical methods, i.e. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and Raman spectroscopy, including distribution mapping of the main phases detected such as amorphous calcium phosphate (ACP), oxyapatite (OA), and HA or ClA. The unexpected formation of oxyapatite in ClA coatings was assigned to a side reaction with contaminating oxygenated species (O2, H2O). ClA coatings exhibited characteristics different from HA, showing a lower content of oxyapatite and amorphous phase. Although their adhesion strength was found to be lower than that of HA coatings, their application could be an interesting alternative, offering, in particular, a larger range of spraying conditions without formation of massive impurities. PMID:25893015

Effect of corona discharge plasma jet on surface-borne microorganisms and sprouting of broccoli seeds.

PubMed

Kim, Je-Wook; Puligundla, Pradeep; Mok, Chulkyoon

2017-01-01

Different pathogenic microorganisms have been reported to cause sprouts-associated outbreaks. In order to sterilise and enhance the germination of seeds, non-thermal plasma has been increasingly investigated in the field of agricultural science as an alternative to the traditional pre-sowing seed treatments. This work aimed to evaluate the effect of corona discharge plasma jet (CDPJ) on disinfection of the natural bio-contaminants of broccoli seed and also studied the plasma effect on sprout seed germination rate and physico-chemical properties of sprouts. Aerobic bacteria, moulds and yeasts, B. cereus, E. coli, Salmonella spp. were detected on the broccoli seed surface. After 0-3 min treatment using CDPJ, the detected microorganisms were reduced in the range of 1.2-2.3 log units. Inactivation patterns were better explained using pseudo-first-order kinetics. The plasma treatment of seeds up to 2 min exhibited a positive effect on germination rate, seedling growth. The physico-chemical and sensory characteristics of sprouts were unaffected due to the CDPJ treatment of their respective seeds. Corona discharge plasma jet can potentially be used for microbial decontamination of broccoli seeds. In addition, the plasma treatment of broccoli sprout seeds has enabled a significant enhancement in their germination rate and seedling growth without compromising physico-chemical and sensory characteristics of their corresponding sprouts. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry.

Thermal barrier coating life prediction model development

NASA Technical Reports Server (NTRS)

Strangman, T. E.; Neumann, J. F.; Tasooji, A.

1985-01-01

This program focuses on predicting the lives of two types of strain-tolerant and oxidation-resistant thermal barrier coating (TBC) systems that are produced by commercial coating suppliers to the gas turbine industry. The plasma-sprayed TBC system is composed of a low pressure, plasma sprayed applied, oxidation resistant NiCrAlY bond coating. The other system is an air plasma sprayed yttria (8 percent) partially stabilized zirconia insulative layer.

Fundamentals and industrial applications of ultrashort pulsed lasers at Bosch

NASA Astrophysics Data System (ADS)

König, Jens; Bauer, Thorsten

2011-03-01

Fundamental results of ablation processes of metals with ultrashort laser pulses in the far threshold fluence regime are shown and discussed. Time-resolved measurements of the plasma transmission exhibit two distinctive minima. The minima occurring within the first nanoseconds can be attributed to electrons and sublimated material emitted from the target surface, whereas the subsequent minimum after several 10 ns is due to particles and droplets after a thermal boiling process. Industrial applications of ultrashort pulsed laser micro machining in the Bosch Group are also shown with the production of exhaust gas sensors and common rail diesel systems. Since 2007, ultrashort laser pulses are used at the BOSCH plant in Bamberg for producing lambda-probes, which are made of a special ceramic layer system and can measure the exhaust gas properties faster and more accurately. This enables further reduction of emissions by optimized combustion control. Since 2009, BOSCH uses ultrashort pulsed lasers for micro-structuring the injector of common rail diesel systems. A drainage groove allows a tight system even at increased pressures up to 2000 bar. Diesel injection is thus even more reliable, powerful and environment-friendly.

Separation of thorium (IV) from lanthanide concentrate (LC) and water leach purification (WLP) residue

DOE Office of Scientific and Technical Information (OSTI.GOV)

AL-Areqi, Wadeeah M.; Majid, Amran Ab.; Sarmani, Sukiman

Thorium (IV) content in industrial residue produced from rare earth elements production industry is one of the challenges to Malaysian environment. Separation of thorium from the lanthanide concentrate (LC) and Water Leach Purification (WLP) residue from rare earth elements production plant is described. Both materials have been tested by sulphuric acid and alkaline digestions. Th concentrations in LC and WLP were determined to be 1289.7 ± 129 and 1952.9±17.6 ppm respectively. The results of separation show that the recovery of Th separation from rare earth in LC after concentrated sulphuric acid dissolution and reduction of acidity to precipitate Th wasmore » found 1.76-1.20% whereas Th recovery from WLP was less than 4% after concentrated acids and alkali digestion processes. Inductively Coupled Plasma-Mass Spectroscopy (ICP-MS) was used to determine Th concentrations in aqueous phase during separation stages. This study indicated that thorium maybe exists in refractory and insoluble form which is difficult to separate by these processes and stays in WLP residue as naturally occurring radioactive material (NORM)« less

Nonthermal physical technologies to decontaminate and extend the shelf-life of fruits and vegetables: Trends aiming at quality and safety.

PubMed

Pinela, José; Ferreira, Isabel C F R

2017-07-03

Minimally processed fruits and vegetables are one of the major growing sectors in food industry. This growing demand for healthy and convenient foods with fresh-like properties is accompanied by concerns surrounding efficacy of the available sanitizing methods to appropriately deal with food-borne diseases. In fact, chemical sanitizers do not provide an efficient microbial reduction, besides being perceived negatively by the consumers, dangerous for human health, and harmful to the environment, and the conventional thermal treatments may negatively affect physical, nutritional, or bioactive properties of these perishable foods. For these reasons, the industry is investigating alternative nonthermal physical technologies, namely innovative packaging systems, ionizing and ultraviolet radiation, pulsed light, high-power ultrasound, cold plasma, high hydrostatic pressure, and dense phase carbon dioxide, as well as possible combinations between them or with other preservation factors (hurdles). This review discusses the potential of these novel or emerging technologies for decontamination and shelf-life extension of fresh and minimally processed fruits and vegetables. Advantages, limitations, and challenges related to its use in this sector are also highlighted.

The kINPen—a review on physics and chemistry of the atmospheric pressure plasma jet and its applications

NASA Astrophysics Data System (ADS)

Reuter, Stephan; von Woedtke, Thomas; Weltmann, Klaus-Dieter

2018-06-01

The kINPen® plasma jet was developed from laboratory prototype to commercially available non-equilibrium cold plasma jet for various applications in materials research, surface treatment and medicine. It has proven to be a valuable plasma source for industry as well as research and commercial use in plasma medicine, leading to very successful therapeutic results and its certification as a medical device. This topical review presents the different kINPen plasma sources available. Diagnostic techniques applied to the kINPen are introduced. The review summarizes the extensive studies of the physics and plasma chemistry of the kINPen performed by research groups across the world, and closes with a brief overview of the main application fields.

Modeling of block copolymer dry etching for directed self-assembly lithography

NASA Astrophysics Data System (ADS)

Belete, Zelalem; Baer, Eberhard; Erdmann, Andreas

2018-03-01

Directed self-assembly (DSA) of block copolymers (BCP) is a promising alternative technology to overcome the limits of patterning for the semiconductor industry. DSA exploits the self-assembling property of BCPs for nano-scale manufacturing and to repair defects in patterns created during photolithography. After self-assembly of BCPs, to transfer the created pattern to the underlying substrate, selective etching of PMMA (poly (methyl methacrylate)) to PS (polystyrene) is required. However, the etch process to transfer the self-assemble "fingerprint" DSA patterns to the underlying layer is still a challenge. Using combined experimental and modelling studies increases understanding of plasma interaction with BCP materials during the etch process and supports the development of selective process that form well-defined patterns. In this paper, a simple model based on a generic surface model has been developed and an investigation to understand the etch behavior of PS-b-PMMA for Ar, and Ar/O2 plasma chemistries has been conducted. The implemented model is calibrated for etch rates and etch profiles with literature data to extract parameters and conduct simulations. In order to understand the effect of the plasma on the block copolymers, first the etch model was calibrated for polystyrene (PS) and poly (methyl methacrylate) (PMMA) homopolymers. After calibration of the model with the homopolymers etch rate, a full Monte-Carlo simulation was conducted and simulation results are compared with the critical-dimension (CD) and selectivity of etch profile measurement. In addition, etch simulations for lamellae pattern have been demonstrated, using the implemented model.

A Computational Chemistry Database for Semiconductor Processing

NASA Technical Reports Server (NTRS)

Jaffe, R.; Meyyappan, M.; Arnold, J. O. (Technical Monitor)

1998-01-01

The concept of 'virtual reactor' or 'virtual prototyping' has received much attention recently in the semiconductor industry. Commercial codes to simulate thermal CVD and plasma processes have become available to aid in equipment and process design efforts, The virtual prototyping effort would go nowhere if codes do not come with a reliable database of chemical and physical properties of gases involved in semiconductor processing. Commercial code vendors have no capabilities to generate such a database, rather leave the task to the user of finding whatever is needed. While individual investigations of interesting chemical systems continue at Universities, there has not been any large scale effort to create a database. In this presentation, we outline our efforts in this area. Our effort focuses on the following five areas: 1. Thermal CVD reaction mechanism and rate constants. 2. Thermochemical properties. 3. Transport properties.4. Electron-molecule collision cross sections. and 5. Gas-surface interactions.

Investigation Of The High-Voltage Discharge On The Surface Of Gas-Liquid System

NASA Astrophysics Data System (ADS)

Nguyen-Kuok, Shi; Morgunov, Aleksandr; Malakhov, Yury; Korotkikh, Ivan

2016-09-01

This paper describes an experimental setup for study of physical processes in the high-voltage discharge on the surface of gas-liquid system at atmospheric pressure. Measurements of electrical and optical characteristics of the high-voltage discharge in gas, at the surface of the gas-liquid system and in the electrolyte are obtained. The parameters of the high-voltage discharge and the conditions for its stable operation are presented. Investigations with various electrolytes and cathode assemblies of various materials and sizes were carried out. The installation can be used for the processing and recycling of industrial and chemical liquid waste. Professor of Laboratory of Plasma Physics, National Research University MPEI, Krasnokazarmennya Str.14, 111250, Moscow, Russia.

Plasma in dentistry: a review of basic concepts and applications in dentistry.

PubMed

Kim, Jae-Hoon; Lee, Mi-Ae; Han, Geum-Jun; Cho, Byeong-Hoon

2014-01-01

Plasma-related technologies are essential in modern industries. Recently, plasma has attracted increased attention in the biomedical field. This paper provides a basic knowledge of plasma and a narrative review of plasma applications in dentistry. To review plasma applications in dentistry, an electronic search in PubMed, SCOPUS and Google scholar up to December 2012 was done. This was followed by extensive hand searching using reference lists from relevant articles. There have been attempts to apply plasma technology in various fields of dentistry including surface modifications of dental implants, adhesion, caries treatment, endodontic treatment and tooth bleaching. Although many studies were in early stages, the potential value of plasma for dental applications has been demonstrated. To enlarge the scope of plasma applications and put relevant research to practical use, interdisciplinary research with participation of dental professionals is required.

Surface Dielectric Barrier Discharge Jet for Skin Disinfection

NASA Astrophysics Data System (ADS)

Creyghton, Yves; Meijer, Rogier; Verweij, Paul; van der Zanden, Frank; Leenders, Paul

A consortium consisting of the research institute TNO, the medical ­university and hospital St Radboud and two industrial enterprises is working on a non-thermal plasma treatment method for hand disinfection. The group is seeking for cooperation, in particular in the field of validation methods and potential ­standardization for plasma based disinfection procedures. The present paper describes technical progress in plasma source development together with initial microbiological data. Particular properties of the sheet shaped plasma volume are the possibility of treating large irregular surfaces in a short period of time, effective plasma produced species transfer to the surface together with high controllability of the nature of plasma species by means of temperature conditioning.

Gas-phase synthesis of semiconductor nanocrystals and its applications

NASA Astrophysics Data System (ADS)

Mandal, Rajib

Luminescent nanomaterials is a newly emerging field that provides challenges not only to fundamental research but also to innovative technology in several areas such as electronics, photonics, nanotechnology, display, lighting, biomedical engineering and environmental control. These nanomaterials come in various forms, shapes and comprises of semiconductors, metals, oxides, and inorganic and organic polymers. Most importantly, these luminescent nanomaterials can have different properties owing to their size as compared to their bulk counterparts. Here we describe the use of plasmas in synthesis, modification, and deposition of semiconductor nanomaterials for luminescence applications. Nanocrystalline silicon is widely known as an efficient and tunable optical emitter and is attracting great interest for applications in several areas. To date, however, luminescent silicon nanocrystals (NCs) have been used exclusively in traditional rigid devices. For the field to advance towards new and versatile applications for nanocrystal-based devices, there is a need to investigate whether these NCs can be used in flexible and stretchable devices. We show how the optical and structural/morphological properties of plasma-synthesized silicon nanocrystals (Si NCs) change when they are deposited on stretchable substrates made of polydimethylsiloxane (PDMS). Synthesis of these NCs was performed in a nonthermal, low-pressure gas phase plasma reactor. To our knowledge, this is the first demonstration of direct deposition of NCs onto stretchable substrates. Additionally, in order to prevent oxidation and enhance the luminescence properties, a silicon nitride shell was grown around Si NCs. We have demonstrated surface nitridation of Si NCs in a single step process using non?thermal plasma in several schemes including a novel dual-plasma synthesis/shell growth process. These coated NCs exhibit SiNx shells with composition depending on process parameters. While measurements including photoluminescence (PL), surface analysis, and defect identification indicate the shell is protective against oxidation compared to Si NCs without any shell growth. Gallium Nitride (GaN) is one of the most well-known semiconductor material and the industry standard for fabricating LEDs. The problem is that epitaxial growth of high-quality GaN requires costly substrates (e.g. sapphire), high temperatures, and long processing times. Synthesizing freestanding NCs of GaN, on the other hand, could enable these novel device morphologies, as the NCs could be incorporated into devices without the requirements imposed by epitaxial GaN growth. Synthesis of GaN NCs was performed using a fully gas-phase process. Different sizes of crystalline GaN nanoparticles were produced indicating versatility of this gas-phase process. Elemental analysis using X-ray photoelectron spectroscopy (XPS) indicated a possible nitrogen deficiency in the NCs; addition of secondary plasma for surface treatment indicates improving stoichiometric ratio and points towards a unique method for creating high-quality GaN NCs with ultimate alloying and doping for full-spectrum luminescence.

76 FR 23824 - Guidance for Industry: “Computer Crossmatch” (Computerized Analysis of the Compatibility Between...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-04-28

... the Compatibility Between the Donor's Cell Type and the Recipient's Serum or Plasma Type... Crossmatch' (Computerized Analysis of the Compatibility between the Donor's Cell Type and the Recipient's... donor's cell type and the recipient's serum or plasma type. The guidance describes practices that we...

Development of very small-diameter, inductively coupled magnetized plasma device

NASA Astrophysics Data System (ADS)

Kuwahara, D.; Mishio, A.; Nakagawa, T.; Shinohara, S.

2013-10-01

In order to miniaturize a high-density, inductively coupled magnetized plasma or helicon plasma to be applied to, e.g., an industrial application and an electric propulsion field, small helicon device has been developed. The specifications of this device along with the experimental results are described. We have succeeded in generating high-density (˜1019 m-3) plasmas using quartz tubes with very small diameters of 10 and 20 mm, with a radio frequency power ˜1200 and 700 W, respectively, in the presence of the magnetic field less than 1 kG.

Development of very small-diameter, inductively coupled magnetized plasma device.

PubMed

Kuwahara, D; Mishio, A; Nakagawa, T; Shinohara, S

2013-10-01

In order to miniaturize a high-density, inductively coupled magnetized plasma or helicon plasma to be applied to, e.g., an industrial application and an electric propulsion field, small helicon device has been developed. The specifications of this device along with the experimental results are described. We have succeeded in generating high-density (~10(19) m(-3)) plasmas using quartz tubes with very small diameters of 10 and 20 mm, with a radio frequency power ~1200 and 700 W, respectively, in the presence of the magnetic field less than 1 kG.

Plasma Synthesis and Sintering of Advanced Ceramics

DTIC Science & Technology

1990-09-15

CONTENTS Page LIST OF TABLES iv OBJECTIVES 1 COLLOIDAL PLASMA PROCESSING: CONCEPTS 1 BACKGROUND 2 Ultrafine Particles 2 Colloidal Plasma 3 Particle...colloidal plasma processing of ceramics. COLLOIDAL PLASMA PROCESSING: CONCEPTS It is well known that ultrafine particles prepared in gas plasmas agglomerate...BACKGROUND Ultrafine Particles . There are well recognized advantages to using small particles in ceramic processing. The instantaneous densification

Understanding anode and cathode behaviour in high-pressure discharge lamps

NASA Astrophysics Data System (ADS)

Flesch, P.; Neiger, M.

2005-09-01

High-intensity discharge (HID) lamps have widespread and modern areas of application including general lighting, video/movie projection (e.g. UHP lamp), street/industrial lighting, and automotive headlight lamps (D2/xenon lamp). Even though HID lamps have been known for several decades now, the important plasma-electrode interactions are still not well understood. Because HID lamps are usually operated on ac (electrodes switch alternately from anode to cathode phase), time-dependent simulations including realistic and verified anode and cathode models are essential. Therefore, a recently published investigation of external laser heating of an electrode during anode and cathode phase in an operating HID lamp [28] provided the basis for our present paper. These measurements revealed impressive influences of the external laser heating on electrode fall voltage and electrode temperature. Fortunately, the effects are very different during anode and cathode phase. Thus, by comparing the experimental findings with results from our numerical simulations we can learn much about the principles of electrode behaviour and explain in detail the differences between anode and cathode phase. Furthermore, we can verify our model (which includes plasma column, hot plasma spots in front of the electrodes, constriction zones and near-electrode non-local thermal equilibrium-plasma as well as anode and cathode) that accounts for all relevant physical processes concerning plasma, electrodes and interactions between them. Moreover, we investigate the influence of two different notions concerning ionization and recombination in the near electrode plasma on the numerical results. This improves our physical understanding of near-electrode plasma likewise and further increases the confidence in the model under consideration. These results are important for the understanding and the further development of HID lamps which, due to their small dimensions, are often experimentally inaccessible. Thus, modelling becomes more and more important.

Using the tritium plasma experiment to evaluate ITER PFC safety

NASA Astrophysics Data System (ADS)

Longhurst, Glen R.; Anderl, Robert A.; Bartlit, John R.; Causey, Rion A.; Haines, John R.

1993-06-01

The Tritium Plasma Experiment was assembled at Sandia National Laboratories, Livermore and is being moved to the Tritium Systems Test Assembly facility at Los Alamos National Laboratory to investigate interactions between dense plasmas at low energies and plasma-facing component materials. This apparatus has the unique capabilty of replicating plasma conditions in a tokamak divertor with particle flux densities of 2 × 1023 ions/m2.s and a plasma temperature of about 15 eV using a plasma that includes tritium. An experimental program has been initiated using the Tritium Plasma Experiment to examine safety issues related to tritium in plasma-facing components, particularly the ITER divertor. Those issues include tritium retention and release characteristics, tritium permeation rates and transient times to coolant streams, surface modification and erosion by the plasma, the effects of thermal loads and cycling, and particulate production. An industrial consortium led by McDonnell Douglas will design and fabricate the test fixtures.

EDITORIAL: Cluster issue on microplasmas

NASA Astrophysics Data System (ADS)

Chao, Chih C.; Liao, Jiunn-Der; Chang, Juu-En

2008-10-01

Ever since the first Workshop on Microplasmas, held in Japan in 2003, plasma scientists and engineers worldwide have been meeting approximately every 18 months to exchange and discuss the results of scientific research and technical applications of this unique type of plasma. Microplasmas are generally described as stable plasmas confined to spatial dimensions below about 1 mm that can be operated at pressures up to and exceeding atmospheric pressure. By their nature, this presents a wide range of opportunities and many advantages in practical applications, just a few examples being low energy consumption, small size, flexibility of use and ease of assembly into a user-friendly package. Nevertheless, there still remain several unanswered basic science questions and a largely untapped potential for environmental, biomedical and industrial applications. The fourth International Workshop on Microplasmas, held during 28-31 October 2007 in Tainan, Taiwan, continued the trend of previous Workshops with an orientation towards industrial and environmental applications. Many high-quality papers on microplasmas and microdischarges were presented and selected full papers were submitted to Journal of Physics D: Applied Physics for assessment by the editors and reviewers in accordance with the usual standards of quality and novelty. This Cluster Issue contains twelve accepted papers, covering four categories: fundamentals and basics, and environmental, biomedical and industrial applications. Fundamentals and basics includes coverage of the physics and microstructure of electrode discharge (Yu A Lebedev et al), the characteristics of low current discharge (Z Lj Petrović et al), plasma ignition (R Gesche et al), novel optical diagnostics (Schulz-von der Gathen et al), plasma generation and micronozzle flow (T Takahashi et al) and the relation between RF-power and atomic oxygen density distribution (N Knake et al). Environmental applications are represented by vapour-phase discharges in liquid capillaries (P Bruggeman et al) and biomedical applications by antibacterial treatment (K D Weltmann et al). Industrial applications include on-chip microplasma reactors (A Agiral et al), miniaturized atmospheric pressure plasma jets (J Schäfer et al and A V Pipa et al) and microplasma stamps (N Lucas et al). All of these represent important findings and advances in microplasma research and applications. We would like to thank the Publisher of the journal, Sarah Quin, and the editorial staff for their support and management of the publication. It is sincerely hoped that the contents of this Cluster Issue will promote understanding of microplasmas and microdischarges, and inspire further research towards industrial applications.

Paradigm shifts in plasma processing and application of fundamental kinetics to problems targeting 5 nm technology device technology

NASA Astrophysics Data System (ADS)

Chen, Lee

2016-09-01

It is often said that semiconductor technology is approaching the end of scaling. While fundamental device limits do approach, plasma etching has been doing the heavy lifting to supplement the basic limits in lithography. RF plasmas, pulsing in many forms, diffusion plasmas are but a few of the important developments over the last 20 years that have succeeded in the seemingly impossible tasks. The commonality of these plasmas is being self-consistent: their near-Boltzmann EEDf maintains ionization with its tail while providing charge-balance with its Te . To control the plasma chemistry is to control its EEDf; the entanglement of ionization with charge-balance in self-consistent plasmas places a constraint on the decoupling of plasma chemistry from ionization. Example like DC/RF parallel-plate hybridizes stochastic heating with DC-cathode injected e- -beam. While such arrangement offers some level of decoupling, it raised more questions than what it helped answered along the lines of beam-plasma instabilities, bounce-resonance ionization, etc. Pure e- -beam plasmas could be a drastic departure from the self-consistent plasmas. Examples like the NRL e- -beam system and the more recent TEL NEP (Nonambipolar e- Plasma) show strong decoupling of Te from ionization but it is almost certain, many more questions lurk: the functions connecting collisional relaxation with instabilities, the channels causing the dissociation of large fluorocarbons (controlling the ion-to- radical ratio), the production of the damaging deep UV in e- -beam plasmas, etc., and the list goes on. IADf is one factor on feature-profile and IEDf determines the surgical surface-excitation governing the selectivity, and both functions have Ti as the origin; what controls the e- -beam plasmas' Ti ? RF-bias has served well in applications requiring energetic excitation but, are there ways to improve the IEDf tightness? What are the adverse side-effects of ``improved IEDf''? Decades ago an infant RF-plasma was thrown into the dry-etch arena and it hit the ground running with much of the understandings as after the facts. While the etching industry enjoys the heavy lifting by the successful self-consistent plasmas, perhaps time can be used on front-loaded soul searching of the ``maybe needed'' plasmas, for the future etching needs.

PREFACE: 15th Latin American Workshop on Plasma Physics (LAWPP 2014) and 21st IAEA TM on Research Using Small Fusion Devices (RUSFD)

NASA Astrophysics Data System (ADS)

Iván Vargas-Blanco, V.; Herrera-Velázquez, J. Julio E.

2015-03-01

Written contributions from participants of the Joint 15th Latin American Workshop on Plasma Physics (LAWPP 2014) - 21st IAEA Technical Meeting on Research Using Small Fusion Devices (21st IAEA TM RUSFD). The International Advisory Committees of the 15th Latin American Workshop on Plasma Physics (LAWPP 2014) and the 21st IAEA TM on Research Using Small Fusion Devices (RUSFD), agreed to carry out together this Joint LAWPP 2014 - 21st RUSFD in San José, Costa Rica, on 27-31 January 2014. The Joint LAWPP 2014 - 21st RUSFD meeting, organized by the Instituto Tecnológico de Costa Rica, Universidad Nacional de Costa Rica, and Ad Astra Rocket Company in collaboration with the International Atomic Energy Agency (IAEA). The Latin American Workshop on Plasma Physics (LAWPP) is a series of events which has been held periodically since 1982, with the purpose of providing a forum in which the research of the Latin American plasma physics community can be displayed, as well as fostering collaborations among plasma scientists within the region and with researchers from the rest of the world. Recognized plasma scientists from developed countries are specially invited to the meeting to present the state of the art on several "hot" topics related to plasma physics. It is an open meeting, with an International Advisory Committee, in which the working language is English. It was firstly held in 1982 in Cambuquira, Brazil, followed by workshops in Medellín, Colombia (1985), Santiago de Chile, Chile (1988), Buenos Aires, Argentina (1990), Mexico City, Mexico (1992), Foz do Iguaçu, Brazil (1994, combined with the International Congress on Plasma Physics (ICPP)), Caracas, Venezuela (1997), Tandil, Argentina (1998), La Serena, Chile (2000), Sao Pedro, Brazil (2003), Mexico City, Mexico (2005), Caracas, Venezuela (2007), Santiago de Chile, Chile (2010, combined with the ICPP) and Mar de Plata, Argentina (2011). The 21st IAEA TM on Research Using Small Fusion Devices is an ideal forum for small laboratory size fusion experiments, as compared to those of the larger laboratories, to report about their latest achievements working with medium size and small scale tokamaks, stellarators, compact tori, dense plasma focus, reversed field pinches, helical devices, linear machines, and other small plasma devices. The Technical Meeting aims at stimulating new synergies which can contribute to better streamline the research outputs to the mainstream fusion research. Previous meetings in the series were held in Budapest, Hungary (1985), Nagoya, Japan (1986), Nice, France (1988), Washington DC, USA (1990), Hefei, China (1991), Wuerzburg, Germany (1992), Campinas, Brazil (1993), Madrid, Spain (1994), Ahmedabad, India (1995), Prague, Czech Republic (1996), Cairo, Egypt (1997), Tokyo, Japan (1998) in Chengdu, China (1999), São Paulo, Brazil (2002), Vienna, Austria (2003) in Mexico City, Mexico (2005), Lisbon, Portugal (2007), in Alushta, Ukraine (2008), Kurchatov, Kazakhstan (2009) and Vienna, Austria (2011). The 1st Costa Rican Summer School on Plasma Physics was held a week before the Joint LAWPP 2014 - 21st IAEA TM RUSFD, and the 2nd Latin American Workshop on Industrial Applications of Plasma Technology (AITP) was organized in parallel with the it. The objective of the AITP Workshop is to enhance the regional academic and industrial cooperation in the field of plasma assisted surface technology. The Joint LAWPP 2014 - 21st IAEA TM RUSFD was held at the Crowne Plaza Corobici Hotel in San José from 27 to 31 January 2014. The LAWPP scientific programme, which was spread along the whole week, had 15 invited speakers, 126 participants from 20 countries around the world. It included 7 plenary talks, 8 invited talks and 12 oral contributed papers were chosen out of 92 submissions. 82 contributions in 25 topics were presented in poster sessions on Monday 27, Tuesday 28 and Thursday 30 January 2014. The 21st IAEA TM RUSFD was held along the LAWPP 2014 from 27 to 29 January 2014 and was attended by 37 participants formally registered with the IAEA, who joined the LAWPP 2014 participants. Its separate scientific programme had two plenary talks, 12 oral presentations and 14 papers presented in poster sessions on Monday 27 and Tuesday 28 January 2014. The 2nd Workshop on Industrial Applications of Plasma Technology (2nd AITP) was held on 30 and 31 January 2014, had six invited speakers, which included 2 plenary talks, 4 invited talks, 11 oral presentations and 31 contributions in a single poster session on Thursday 30 January, 2014. Its proceedings have been merged with those of the joint meeting. Finally the 1st Costa Rican Summer School on Plasma Physics, held in Santa Clara, San Carlos on 20-24 January 2014, in the week previous to the meetings, had 80 participants, 40 international conferences on different plasma physics topics, and 12 professors. The topics included in the programme of the Joint LAWPP 2014 - 21st IAEA TM RUSFD were: space plasmas, dusty plasmas, nuclear fusion, nonthermal plasmas, plasma space propulsion, basic plasma processes, plasma simulation, and industrial plasma applications among others. We are very grateful to the sponsors of the meetings: the Instituto Tecnológico de Costa Rica, the International Atomic Energy Agency (IAEA), the Universidad Nacional de Costa Rica, and Ad Astra Rocket Company. We also want to thank our exhibitors and contributors: INTERCOVAMEX, Nuclear & Plasma Sciences Society, and the IEEE Costa Rica Chapter. The publication of the proceedings was fully supported by the International Atomic Energy Agency (IAEA). The support of the International Advisory and the Local Organizing Committees, is also acknowledged in a heartfelt way. Finally, the Editors of this special issue are grateful to José Asenjo for his excellent work and cooperation for the preparation of the proceedings. Iván Vargas-Blanco and J. Julio E. Herrera-Velázquez Editors of the proceedings

Functionalization of nanomaterials by non-thermal large area atmospheric pressure plasmas: application to flexible dye-sensitized solar cells.

PubMed

Jung, Heesoo; Park, Jaeyoung; Yoo, Eun Sang; Han, Gill-Sang; Jung, Hyun Suk; Ko, Min Jae; Park, Sanghoo; Choe, Wonho

2013-09-07

A key challenge to the industrial application of nanotechnology is the development of fabrication processes for functional devices based on nanomaterials which can be scaled up for mass production. In this report, we disclose the results of non-thermal radio-frequency (rf) atmospheric pressure plasma (APP) based deposition of TiO2 nanoparticles on a flexible substrate for the fabrication of dye-sensitized solar cells (DSSCs). Operating at 190 °C without a vacuum enclosure, the APP method can avoid thermal damage and vacuum compatibility restrictions and utilize roll-to-roll processing over a large area. The various analyses of the TiO2 films demonstrate that superior film properties can be obtained by the non-thermal APP method when compared with the thermal sintering process operating at 450 °C. The crystallinity of the anatase TiO2 nanoparticles is significantly improved without thermal agglomeration, while the surface defects such as Ti(3+) ions are eliminated, thus providing efficient charge collecting properties for solar cells. Finally, we successfully fabricated a flexible DSSC with an energy conversion efficiency of 4.2% using a transparent plastic substrate. This work demonstrates the potential of non-thermal APP technology in the area of device-level, nano-enabled material manufacturing.

Oxidation and particle deposition modeling in plasma spraying of Ti-6Al-4V/SiC fiber composites

NASA Astrophysics Data System (ADS)

Cochelin, E.; Borit, F.; Frot, G.; Jeandin, M.; Decker, L.; Jeulin, D.; Taweel, B. Al; Michaud, V.; Noël, P.

1999-03-01

Plasma spraying is known to be a promising process for the manufacturing of Ti/SiC long-fiber composites. However, some improvements remain for this process to be applied in an industrial route. These include: oxygen contamination of the sprayed material through that of titanium particles before and during spraying, damage to fibers due to a high level of thermal stresses induced at the spraying stage, adequate deposition of titanium-base powder to achieve a low-porosity matrix and good impregnation of the fiber array. This article deals with work that resulted in a threefold study of the process. Oxidation was studied using electron microprobe analysis of elementary particles quenched and trapped into a closed box at various given flight distances. Oxygen diffusion phenomena within the particles are discussed from a preliminary theoretical approach coupled with experimental data. Isothermal and thermomechanical calculations were made using the ABAQUS code to determine stresses arising from contact of a liquid Ti-6Al-4V particle onto a SiC fiber. On the scale of the sprayed powder flow, a two-dimensional new type of model simulating the deposition of droplets onto a substrate was developed. This new type of model is based on a lattice-gas automaton that reproduces the hydrodynamical behavior of fluids.

21 CFR 640.34 - Processing.

Code of Federal Regulations, 2010 CFR

2010-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

21 CFR 640.34 - Processing.

Code of Federal Regulations, 2012 CFR

2012-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

21 CFR 640.34 - Processing.

Code of Federal Regulations, 2011 CFR

2011-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

21 CFR 640.34 - Processing.

Code of Federal Regulations, 2013 CFR

2013-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

21 CFR 640.34 - Processing.

Code of Federal Regulations, 2014 CFR

2014-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

Element Distribution in Silicon Refining: Thermodynamic Model and Industrial Measurements

NASA Astrophysics Data System (ADS)

Næss, Mari K.; Kero, Ida; Tranell, Gabriella; Tang, Kai; Tveit, Halvard

2014-11-01

To establish an overview of impurity elemental distribution among silicon, slag, and gas/fume in the refining process of metallurgical grade silicon (MG-Si), an industrial measurement campaign was performed at the Elkem Salten MG-Si plant in Norway. Samples of in- and outgoing mass streams, i.e., tapped Si, flux and cooling materials, refined Si, slag, and fume, were analyzed by high-resolution inductively coupled plasma mass spectrometry (HR-ICP-MS), with respect to 62 elements. The elemental distributions were calculated and the experimental data compared with equilibrium estimations based on commercial and proprietary, published databases and carried out using the ChemSheet software. The results are discussed in terms of boiling temperatures, vapor pressures, redox potentials, and activities of the elements. These model calculations indicate a need for expanded databases with more and reliable thermodynamic data for trace elements in general and fume constituents in particular.

Real time capable infrared thermography for ASDEX Upgrade

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sieglin, B., E-mail: Bernhard.Sieglin@ipp.mpg.de; Faitsch, M.; Herrmann, A.

2015-11-15

Infrared (IR) thermography is widely used in fusion research to study power exhaust and incident heat load onto the plasma facing components. Due to the short pulse duration of today’s fusion experiments, IR systems have mostly been designed for off-line data analysis. For future long pulse devices (e.g., Wendelstein 7-X, ITER), a real time evaluation of the target temperature and heat flux is mandatory. This paper shows the development of a real time capable IR system for ASDEX Upgrade. A compact IR camera has been designed incorporating the necessary magnetic and electric shielding for the detector, cooler assembly. The cameramore » communication is based on the Camera Link industry standard. The data acquisition hardware is based on National Instruments hardware, consisting of a PXIe chassis inside and a fibre optical connected industry computer outside the torus hall. Image processing and data evaluation are performed using real time LabVIEW.« less

Improvement of the antioxidant and hypolipidaemic effects of cowpea flours (Vigna unguiculata) by fermentation: results of in vitro and in vivo experiments.

PubMed

Kapravelou, Garyfallia; Martínez, Rosario; Andrade, Ana M; López Chaves, Carlos; López-Jurado, María; Aranda, Pilar; Arrebola, Francisco; Cañizares, Francisco J; Galisteo, Milagros; Porres, Jesús M

2015-04-01

The antioxidant capacity and hypolipidaemic effects of Vigna unguiculata, as well as their potential improvement by different fermentation and thermal processes were studied using in vitro and in vivo methods. Phenolic content and reducing capacity of legume acetone extract were significantly increased by different fermentation processes, and by the thermal treatment of fermented legume flours. TBARS inhibiting capacity was increased by fermentation but not by thermal treatment. A higher ability to decrease Cu(2+)/H2O2-induced electrophoretic mobility of LDL was found in fermented when compared to raw legume extracts, and a higher protective effect on short term metabolic status of HT-29 cells was found for raw and lactobacillus-fermented Vigna followed by naturally fermented Vigna extracts. Significant improvements in plasma antioxidant capacity and hepatic activity of antioxidant enzymes were observed in rats that consumed fermented legume flours when compared to the untreated legume or a casein-methionine control diet. In addition, liver weight and plasma levels of cholesterol and triglycerides were also positively affected by untreated or naturally fermented Vigna. V. unguiculata has demonstrated its potential as a functional food with interesting antioxidant and lipid lowering properties, which can be further augmented by fermentation processes associated or not to thermal processing. © 2014 Society of Chemical Industry.

Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications

NASA Astrophysics Data System (ADS)

Delachat, F.; Le Drogoff, B.; Constancias, C.; Delprat, S.; Gautier, E.; Chaker, M.; Margot, J.

2016-01-01

In this work, we demonstrate a full process for fabricating high aspect ratio diffraction optics for extreme ultraviolet lithography. The transmissive optics consists in nanometer scale tungsten patterns standing on flat, ultrathin (100 nm) and highly transparent (>85% at 13.5 nm) silicon membranes (diameter of 1 mm). These tungsten patterns were achieved using an innovative pseudo-Bosch etching process based on an inductively coupled plasma ignited in a mixture of SF6 and C4F8. Circular ultra-thin Si membranes were fabricated through a state-of-the-art method using direct-bonding with thermal difference. The silicon membranes were sputter-coated with a few hundred nanometers (100-300 nm) of stress-controlled tungsten and a very thin layer of chromium. Nanoscale features were written in a thin resist layer by electron beam lithography and transferred onto tungsten by plasma etching of both the chromium hard mask and the tungsten layer. This etching process results in highly anisotropic tungsten features at room temperature. The homogeneity and the aspect ratio of the advanced pattern transfer on the membranes were characterized with scanning electron microscopy after focus ion beam milling. An aspect ratio of about 6 for 35 nm size pattern is successfully obtained on a 1 mm diameter 100 nm thick Si membrane. The whole fabrication process is fully compatible with standard industrial semiconductor technology.

The synergetic effect of UV rays on the decomposition of xylene in dielectric barrier discharge plasma and photocatalyst process

NASA Astrophysics Data System (ADS)

Li, Wenjuan; Gu, Zhenyu; Teng, Fuhua; Lu, Jianhai; Dong, Shibi; Miao, Xiaoping; Wu, Zhongbiao

2018-06-01

The degradation of xylene in the dielectric barrier discharge plasma and photocatalyst process was studied, focusing on the synergetic effect of UV rays from plasma process and external UV lamps on the decomposition of xylene. The results showed that xylene could be decomposed by the discharge process in plasma system, whereas the UV rays from plasma process was very weak. After adding TiO2, the removal efficiency of xylene and energy yield in plasma process were enhanced since energetic particles activated the catalysis of TiO2. The removal efficiency of xylene and energy field in plasma and photocatalyst process combined with external UV lamps were further enhanced attributed to the degradation effect of plasma, the catalysis of TiO2 activated by plasma, the photolysis of UV rays and the photocatalysis of photocatalyst. The synergetic effect of UV rays from external UV lamps was obvious.

Multiphase High-Frequency Isolated DC-DC Converter for Industrial Applications

NASA Astrophysics Data System (ADS)

Maurya, Rakesh; Srivastava, S. P.; Agarwal, Pramod

2014-01-01

Industrial applications such as welding, plasma cutting, and surface hardening require a large DC current at low voltage. In such applications, the rating of power supply varies from few kilowatts to hundreds of kilowatts. The power supply employs in such applications particularly in arc welding process is expected to operate from open-circuit (no-load) to short-circuit (when the electrode sticks to the workpiece for a short span of time) quickly. In this paper, high-frequency isolated multiphase DC-DC converter is proposed which is well suited for aforementioned applications. Based on mathematical analysis, a simulation study with 5 kW, 5 V/1,000 A proposed model is carried out using Simulink block set and Sim Power System tool box and its performances are evaluated under symmetrical control methods. To verify the simulation results, scaled prototype model of rating 1.5 V/100 A is developed and tested with aforementioned control method under different operating conditions. In comparison with conventional welding power supply employed in many industries, the performance of proposed converter is improved significantly in terms of size and weight, efficiency and dynamic response.

Alternative modeling methods for plasma-based Rf ion sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Veitzer, Seth A., E-mail: veitzer@txcorp.com; Kundrapu, Madhusudhan, E-mail: madhusnk@txcorp.com; Stoltz, Peter H., E-mail: phstoltz@txcorp.com

Rf-driven ion sources for accelerators and many industrial applications benefit from detailed numerical modeling and simulation of plasma characteristics. For instance, modeling of the Spallation Neutron Source (SNS) internal antenna H{sup −} source has indicated that a large plasma velocity is induced near bends in the antenna where structural failures are often observed. This could lead to improved designs and ion source performance based on simulation and modeling. However, there are significant separations of time and spatial scales inherent to Rf-driven plasma ion sources, which makes it difficult to model ion sources with explicit, kinetic Particle-In-Cell (PIC) simulation codes. Inmore » particular, if both electron and ion motions are to be explicitly modeled, then the simulation time step must be very small, and total simulation times must be large enough to capture the evolution of the plasma ions, as well as extending over many Rf periods. Additional physics processes such as plasma chemistry and surface effects such as secondary electron emission increase the computational requirements in such a way that even fully parallel explicit PIC models cannot be used. One alternative method is to develop fluid-based codes coupled with electromagnetics in order to model ion sources. Time-domain fluid models can simulate plasma evolution, plasma chemistry, and surface physics models with reasonable computational resources by not explicitly resolving electron motions, which thereby leads to an increase in the time step. This is achieved by solving fluid motions coupled with electromagnetics using reduced-physics models, such as single-temperature magnetohydrodynamics (MHD), extended, gas dynamic, and Hall MHD, and two-fluid MHD models. We show recent results on modeling the internal antenna H{sup −} ion source for the SNS at Oak Ridge National Laboratory using the fluid plasma modeling code USim. We compare demonstrate plasma temperature equilibration in two-temperature MHD models for the SNS source and present simulation results demonstrating plasma evolution over many Rf periods for different plasma temperatures. We perform the calculations in parallel, on unstructured meshes, using finite-volume solvers in order to obtain results in reasonable time.« less

Alternative modeling methods for plasma-based Rf ion sources.

PubMed

Veitzer, Seth A; Kundrapu, Madhusudhan; Stoltz, Peter H; Beckwith, Kristian R C

2016-02-01

Rf-driven ion sources for accelerators and many industrial applications benefit from detailed numerical modeling and simulation of plasma characteristics. For instance, modeling of the Spallation Neutron Source (SNS) internal antenna H(-) source has indicated that a large plasma velocity is induced near bends in the antenna where structural failures are often observed. This could lead to improved designs and ion source performance based on simulation and modeling. However, there are significant separations of time and spatial scales inherent to Rf-driven plasma ion sources, which makes it difficult to model ion sources with explicit, kinetic Particle-In-Cell (PIC) simulation codes. In particular, if both electron and ion motions are to be explicitly modeled, then the simulation time step must be very small, and total simulation times must be large enough to capture the evolution of the plasma ions, as well as extending over many Rf periods. Additional physics processes such as plasma chemistry and surface effects such as secondary electron emission increase the computational requirements in such a way that even fully parallel explicit PIC models cannot be used. One alternative method is to develop fluid-based codes coupled with electromagnetics in order to model ion sources. Time-domain fluid models can simulate plasma evolution, plasma chemistry, and surface physics models with reasonable computational resources by not explicitly resolving electron motions, which thereby leads to an increase in the time step. This is achieved by solving fluid motions coupled with electromagnetics using reduced-physics models, such as single-temperature magnetohydrodynamics (MHD), extended, gas dynamic, and Hall MHD, and two-fluid MHD models. We show recent results on modeling the internal antenna H(-) ion source for the SNS at Oak Ridge National Laboratory using the fluid plasma modeling code USim. We compare demonstrate plasma temperature equilibration in two-temperature MHD models for the SNS source and present simulation results demonstrating plasma evolution over many Rf periods for different plasma temperatures. We perform the calculations in parallel, on unstructured meshes, using finite-volume solvers in order to obtain results in reasonable time.

Intense fusion neutron sources

NASA Astrophysics Data System (ADS)

Kuteev, B. V.; Goncharov, P. R.; Sergeev, V. Yu.; Khripunov, V. I.

2010-04-01

The review describes physical principles underlying efficient production of free neutrons, up-to-date possibilities and prospects of creating fission and fusion neutron sources with intensities of 1015-1021 neutrons/s, and schemes of production and application of neutrons in fusion-fission hybrid systems. The physical processes and parameters of high-temperature plasmas are considered at which optimal conditions for producing the largest number of fusion neutrons in systems with magnetic and inertial plasma confinement are achieved. The proposed plasma methods for neutron production are compared with other methods based on fusion reactions in nonplasma media, fission reactions, spallation, and muon catalysis. At present, intense neutron fluxes are mainly used in nanotechnology, biotechnology, material science, and military and fundamental research. In the near future (10-20 years), it will be possible to apply high-power neutron sources in fusion-fission hybrid systems for producing hydrogen, electric power, and technological heat, as well as for manufacturing synthetic nuclear fuel and closing the nuclear fuel cycle. Neutron sources with intensities approaching 1020 neutrons/s may radically change the structure of power industry and considerably influence the fundamental and applied science and innovation technologies. Along with utilizing the energy produced in fusion reactions, the achievement of such high neutron intensities may stimulate wide application of subcritical fast nuclear reactors controlled by neutron sources. Superpower neutron sources will allow one to solve many problems of neutron diagnostics, monitor nano-and biological objects, and carry out radiation testing and modification of volumetric properties of materials at the industrial level. Such sources will considerably (up to 100 times) improve the accuracy of neutron physics experiments and will provide a better understanding of the structure of matter, including that of the neutron itself.

Design of novel dual-port tapered waveguide plasma apparatus by numerical analysis

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhang, D.; Zhou, R.; Yang, X. Q., E-mail: yyxxqq-mail@163.com

Microwave plasma apparatus is often of particular interest due to their superiority of low cost, electrode contamination free, and suitability for industrial production. However, there exist problems of unstable plasma and low electron density in conventional waveguide apparatus based on single port, due to low strength and non-uniformity of microwave field. This study proposes a novel dual-port tapered waveguide plasma apparatus based on power-combining technique, to improve the strength and uniformity of microwave field for the applications of plasma. A 3D model of microwave-induced plasma (field frequency 2.45 GHz) in argon at atmospheric pressure is presented. On the condition thatmore » the total input power is 500 W, simulations indicate that coherent power-combining will maximize the electric-field strength to 3.32 × 10{sup 5 }V/m and improve the uniformity of distributed microwave field, which raised 36.7% and 47.2%, respectively, compared to conventional waveguide apparatus of single port. To study the optimum conditions for industrial application, a 2D argon fluid model based on above structure is presented. It demonstrates that relatively uniform and high-density plasma is obtained at an argon flow rate of 200 ml/min. The contrastive result of electric-field distribution, electron density, and gas temperature is also valid and clearly proves the superiority of coherent power-combining to conventional technique in flow field.« less

Plasma characteristics of direct current enhanced cylindrical inductively coupled plasma source

NASA Astrophysics Data System (ADS)

Yue, HUA; Jian, SONG; Zeyu, HAO; Chunsheng, REN

2018-06-01

Experimental results of a direct current enhanced inductively coupled plasma (DCE-ICP) source which consists of a typical cylindrical ICP source and a plate-to-grid DC electrode are reported. With the use of this new source, the plasma characteristic parameters, namely, electron density, electron temperature and plasma uniformity, are measured by Langmuir floating double probe. It is found that DC discharge enhances the electron density and decreases the electron temperature, dramatically. Moreover, the plasma uniformity is obviously improved with the operation of DC and radio frequency (RF) hybrid discharge. Furthermore, the nonlinear enhancement effect of electron density with DC + RF hybrid discharge is confirmed. The presented observation indicates that the DCE-ICP source provides an effective method to obtain high-density uniform plasma, which is desirable for practical industrial applications.

Optical Emission Studies of the NRL Plasma Torch for the Shipboard Waste Treatment Program

DTIC Science & Technology

1999-02-26

Arc Heating of Molten Steel in a Tundish", Plasma Chemistry and Plasma Processing, Vol.14, pp.361-381,1994. [3] H. Herman, "Plasma-sprayed...Treatment", Plasma Chemistry and Plasma Processing, Vol.15, pp.677-692,1995. [5] S. Paik and H.D. Nguyen, "Numerical Modeling of Multiphase Plasma/Soil Row...Gleizes, S. Vacquie and P. Brunelot, "Modeling of the Cathode Jet of a High- Power Transferred Arc", Plasma Chemistry and Plasma Processing, Vol.13

Plasma elaidic acid level as biomarker of industrial trans fatty acids and risk of weight change: report from the EPIC study.

PubMed

Chajès, Véronique; Biessy, Carine; Ferrari, Pietro; Romieu, Isabelle; Freisling, Heinz; Huybrechts, Inge; Scalbert, Augustin; Bueno de Mesquita, Bas; Romaguera, Dora; Gunter, Marc J; Vineis, Paolo; Hansen, Camilla Plambeck; Jakobsen, Marianne Uhre; Clavel-Chapelon, Françoise; Fagherazzi, Guy; Boutron-Ruault, Marie-Christine; Katzke, Verana; Neamat-Allah, Jasmine; Boeing, Heiner; Bachlechner, Ursula; Trichopoulou, Antonia; Naska, Androniki; Orfanos, Philippos; Pala, Valeria; Masala, Giovanna; Mattiello, Amalia; Skeie, Guri; Weiderpass, Elisabete; Agudo, Antonio; Huerta, Jose Maria; Ardanaz, Eva; Sánchez, Maria Jose; Dorronsoro, Miren; Quirós, Jose Ramon; Johansson, Ingegerd; Winkvist, Anna; Sonested, Emily; Key, Tim; Khaw, Kay-Tee; Wareham, Nicolas J; Peeters, Petra H M; Slimani, Nadia

2015-01-01

Few epidemiological studies have examined the association between dietary trans fatty acids and weight gain, and the evidence remains inconsistent. The main objective of the study was to investigate the prospective association between biomarker of industrial trans fatty acids and change in weight within the large study European Prospective Investigation into Cancer and Nutrition (EPIC) cohort. Baseline plasma fatty acid concentrations were determined in a representative EPIC sample from the 23 participating EPIC centers. A total of 1,945 individuals were followed for a median of 4.9 years to monitor weight change. The association between elaidic acid level and percent change of weight was investigated using a multinomial logistic regression model, adjusted by length of follow-up, age, energy, alcohol, smoking status, physical activity, and region. In women, doubling elaidic acid was associated with a decreased risk of weight loss (odds ratio (OR) = 0.69, 95% confidence interval (CI) = 0.55-0.88, p = 0.002) and a trend was observed with an increased risk of weight gain during the 5-year follow-up (OR = 1.23, 95% CI = 0.97-1.56, p = 0.082) (p-trend<.0001). In men, a trend was observed for doubling elaidic acid level and risk of weight loss (OR = 0.82, 95% CI = 0.66-1.01, p = 0.062) while no significant association was found with risk of weight gain during the 5-year follow-up (OR = 1.08, 95% CI = 0.88-1.33, p = 0.454). No association was found for saturated and cis-monounsaturated fatty acids. These data suggest that a high intake of industrial trans fatty acids may decrease the risk of weight loss, particularly in women. Prevention of obesity should consider limiting the consumption of highly processed foods, the main source of industrially-produced trans fatty acids.

Plasma Elaidic Acid Level as Biomarker of Industrial Trans Fatty Acids and Risk of Weight Change: Report from the EPIC Study

PubMed Central

Chajès, Véronique; Biessy, Carine; Ferrari, Pietro; Romieu, Isabelle; Freisling, Heinz; Huybrechts, Inge; Scalbert, Augustin; Bueno de Mesquita, Bas; Romaguera, Dora; Gunter, Marc J.; Vineis, Paolo; Hansen, Camilla Plambeck; Jakobsen, Marianne Uhre; Clavel-Chapelon, Françoise; Fagherazzi, Guy; Boutron-Ruault, Marie-Christine; Katzke, Verana; Neamat-Allah, Jasmine; Boeing, Heiner; Bachlechner, Ursula; Trichopoulou, Antonia; Naska, Androniki; Orfanos, Philippos; Pala, Valeria; Masala, Giovanna; Mattiello, Amalia; Skeie, Guri; Weiderpass, Elisabete; Agudo, Antonio; Huerta, Jose Maria; Ardanaz, Eva; Sánchez, Maria Jose; Dorronsoro, Miren; Quirós, Jose Ramon; Johansson, Ingegerd; Winkvist, Anna; Sonested, Emily; Key, Tim; Khaw, Kay-Tee; Wareham, Nicolas J.; Peeters, Petra H.M.; Slimani, Nadia

2015-01-01

Background Few epidemiological studies have examined the association between dietary trans fatty acids and weight gain, and the evidence remains inconsistent. The main objective of the study was to investigate the prospective association between biomarker of industrial trans fatty acids and change in weight within the large study European Prospective Investigation into Cancer and Nutrition (EPIC) cohort. Methods Baseline plasma fatty acid concentrations were determined in a representative EPIC sample from the 23 participating EPIC centers. A total of 1,945 individuals were followed for a median of 4.9 years to monitor weight change. The association between elaidic acid level and percent change of weight was investigated using a multinomial logistic regression model, adjusted by length of follow-up, age, energy, alcohol, smoking status, physical activity, and region. Results In women, doubling elaidic acid was associated with a decreased risk of weight loss (odds ratio (OR) = 0.69, 95% confidence interval (CI) = 0.55-0.88, p = 0.002) and a trend was observed with an increased risk of weight gain during the 5-year follow-up (OR = 1.23, 95% CI = 0.97-1.56, p = 0.082) (p-trend<.0001). In men, a trend was observed for doubling elaidic acid level and risk of weight loss (OR = 0.82, 95% CI = 0.66-1.01, p = 0.062) while no significant association was found with risk of weight gain during the 5-year follow-up (OR = 1.08, 95% CI = 0.88-1.33, p = 0.454). No association was found for saturated and cis-monounsaturated fatty acids. Conclusions These data suggest that a high intake of industrial trans fatty acids may decrease the risk of weight loss, particularly in women. Prevention of obesity should consider limiting the consumption of highly processed foods, the main source of industrially-produced trans fatty acids. PMID:25675445

Cold plasma reduces Salmonella on sliced roma tomatoes: efficacy of air versus nitrogen

USDA-ARS?s Scientific Manuscript database

A rapid, waterless, contact-free method of decontamination for tomatoes and tomato slices is of interest to processors and the food service industry. Cold plasma is a novel antimicrobial treatment for fresh and fresh-cut fruits and vegetables. Slices of Roma tomatoes were spot inoculated with three ...

High degree reduction and restoration of graphene oxide on SiO2 at low temperature via remote Cu-assisted plasma treatment.

PubMed

Obata, Seiji; Sato, Minoru; Akada, Keishi; Saiki, Koichiro

2018-06-15

A high throughput synthesis method of graphene has been required for a long time to apply graphene to industrial applications. Of the various synthesis methods, the chemical exfoliation of graphite via graphene oxide (GO) is advantageous as far as productivity is concerned; however, the quality of the graphene produced by this method is far inferior to that synthesized by other methods, such as chemical vapor deposition on metals. Developing an effective reduction and restoration method for GO on dielectric substrates has been therefore a key issue. Here, we present a method for changing GO deposited on a dielectric substrate into high crystallinity graphene at 550 °C; this method uses CH 4 /H 2 plasma and a Cu catalyst. We found that Cu remotely catalyzed the high degree reduction and restoration of GO on SiO 2 and the effect ranged over at least 8 mm. With this method, field-effect transistor devices can be fabricated without any post treatment such as a transfer process. This plasma treatment increased electron and hole mobilities of GO to 480 cm 2 V -1 s -1 and 460 cm 2 V -1 s -1 respectively; these values were more than 50 times greater than that of conventional reduced GO. Furthermore, the on-site conversion ensured that the shape of the GO sheets remained unchanged after the treatment. This plasma treatment realizes the high throughput synthesis of a desired shaped graphene on any substrate without any residue and damage being caused by the transfer process; as such, it expands the potential applicability of graphene.

High degree reduction and restoration of graphene oxide on SiO2 at low temperature via remote Cu-assisted plasma treatment

NASA Astrophysics Data System (ADS)

Obata, Seiji; Sato, Minoru; Akada, Keishi; Saiki, Koichiro

2018-06-01

A high throughput synthesis method of graphene has been required for a long time to apply graphene to industrial applications. Of the various synthesis methods, the chemical exfoliation of graphite via graphene oxide (GO) is advantageous as far as productivity is concerned; however, the quality of the graphene produced by this method is far inferior to that synthesized by other methods, such as chemical vapor deposition on metals. Developing an effective reduction and restoration method for GO on dielectric substrates has been therefore a key issue. Here, we present a method for changing GO deposited on a dielectric substrate into high crystallinity graphene at 550 °C this method uses CH4/H2 plasma and a Cu catalyst. We found that Cu remotely catalyzed the high degree reduction and restoration of GO on SiO2 and the effect ranged over at least 8 mm. With this method, field-effect transistor devices can be fabricated without any post treatment such as a transfer process. This plasma treatment increased electron and hole mobilities of GO to 480 cm2 V‑1 s‑1 and 460 cm2 V‑1 s‑1 respectively; these values were more than 50 times greater than that of conventional reduced GO. Furthermore, the on-site conversion ensured that the shape of the GO sheets remained unchanged after the treatment. This plasma treatment realizes the high throughput synthesis of a desired shaped graphene on any substrate without any residue and damage being caused by the transfer process; as such, it expands the potential applicability of graphene.

Diagnostics of capacitively-coupled hydrocarbon plasmas for deposition of diamond-like carbon films using quadrupole mass spectrometry and Langmuir probe

NASA Astrophysics Data System (ADS)

Oda, Akinori; Fukai, Shun; Kousaka, Hiroyuki; Ohta, Takayuki

2015-09-01

Diamond-like carbon (DLC) films are the hydrogenated amorphous carbon films, which contains a mixture of sp2- and sp3-bonded carbon. The DLC films have been widely used for various applications, such as automotive, semiconductors, medical devices, since have excellent material properties in lower friction, higher chemical stability, higher hardness, higher wear resistance. Until now, numerous investigations on the DLC films using plasma assisted chemical vapor deposition have been done. For precise control of coating technique of DLC films, it is enormously important to clarify the fundamental properties in hydrocarbon plasmas, as a source of hydrocarbon ions and radicals. In this paper, the fundamental properties in a low pressure radio-frequency hydrocarbon (Ar/CH4 (1 %) gas mixture) plasmas have been diagnosed using a quadrupole mass spectrometer (HIDEN ANARYTICAL Ltd., EQP-300) and Langmuir probe system (HIDEN ANARYTICAL Ltd., ESPion). This work was partly supported by KAKENHI (No.26420247), and a ``Grant for Advanced Industrial Technology Development (No.11B06004d)'' in 2011 from the New Energy and Industrial Technology Development Organization (NEDO) of Japan.

Design of an Fiber-Coupled Laser Heterodyne Interferometer for the FLARE

NASA Astrophysics Data System (ADS)

Frank, Samuel; Yoo, Jongsoo; Ji, Hantao; Jara-Almonte, Jon

2016-10-01

The FLARE (Facility for Laboratory Reconnection Experiments), which is currently under construction at PPPL, requires a complete set of laboratory plasma diagnostics. The Langmuir probes that will be used in the device to gather local density data require a reliable interferometer system to serve as baseline for density measurement calibration. A fully fiber-coupled infrared laser heterodyne interferometer has been designed in order to serve as the primary line-integrated electron density diagnostic. Thanks to advances in the communications industry many fiber optic devices and phase detection methods have advanced significantly becoming increasingly reliable and inexpensive. Fully fiber coupling a plasma interferometer greatly simplifies alignment procedures needed since the only free space laser path needing alignment is through the plasma itself. Fiber-coupling also provides significant resistance to vibrational noise, a common problem in plasma interferometry systems. This device also uses a greatly simplified phase detection scheme in which chips, originally developed for the communications industry, capable of directly detecting the phase shift of a signal with high time resolution. The design and initial performance of the system will be discussed.

Modified quadrupole mass analyzer RGA-100 for beam plasma research in forevacuum pressure range

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zolotukhin, D. B.; Tyunkov, A. V.; Yushkov, Yu. G., E-mail: yuyushkov@gmail.com

2015-12-15

The industrial quadrupole RGA-100 residual gas analyzer was modified for the research of electron beam-generated plasma at forevacuum pressure range. The standard ionizer of the RGA-100 was replaced by three electrode extracting unit. We made the optimization of operation parameters in order to provide the maximum values of measured currents of any ion species. The modified analyzer was successfully tested with beam plasma of argon, nitrogen, oxygen, and hydrocarbons.

Improved Si0.5Ge0.5/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopy

NASA Astrophysics Data System (ADS)

Liao, M.-H.; Chen, C.-H.

2013-04-01

The Positron Annihilation Spectra (PAS), Raman, and Photoluminescence spectroscopy reveal that Si0.5Ge0.5/Si interface quality can be significantly improved by the low energy plasma cleaning process using hydrogen. In the PAS, the particularly small value of lifetime and intensity near the Si0.5Ge0.5/Si interface in the sample with the treatment indicate that the defect concentration is successfully reduced 2.25 times, respectively. Fewer defects existed in the Si0.5Ge0.5/Si interface result in the high compressive strain about 0.36% in the top epi-Si0.5Ge0.5 layer, which can be observed in Raman spectra and stronger radiative recombination rate about 1.39 times for the infrared emission, which can be observed in the photoluminescence spectra. With better Si0.5Ge0.5/Si interface quality, the SiGe-based devices can have better optical and electrical characteristics for more applications in the industry. The PAS is also demonstrated that it is the useful methodology tool to quantify the defect information in the SiGe-based material.

Surface morphology and grain analysis of successively industrially grown amorphous hydrogenated carbon films (a-C:H) on silicon

NASA Astrophysics Data System (ADS)

Catena, Alberto; McJunkin, Thomas; Agnello, Simonpietro; Gelardi, Franco M.; Wehner, Stefan; Fischer, Christian B.

2015-08-01

Silicon (1 0 0) has been gradually covered by amorphous hydrogenated carbon (a-C:H) films via an industrial process. Two types of these diamond-like carbon (DLC) coatings, one more flexible (f-DLC) and one more robust (r-DLC), have been investigated. Both types have been grown by a radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) technique with acetylene plasma. Surface morphologies have been studied in detail by atomic force microscopy (AFM) and Raman spectroscopy has been used to investigate the DLC structure. Both types appeared to have very similar morphology and sp2 carbon arrangement. The average height and area for single grains have been analyzed for all depositions. A random distribution of grain heights was found for both types. The individual grain structures between the f- and r-type revealed differences: the shape for the f-DLC grains is steeper than for the r-DLC grains. By correlating the average grain heights to the average grain areas for all depositions a limited region is identified, suggesting a certain regularity during the DLC deposition mechanisms that confines both values. A growth of the sp2 carbon entities for high r-DLC depositions is revealed and connected to a structural rearrangement of carbon atom hybridizations and hydrogen content in the DLC structure.

In vitro cell culture, platelet adhesion tests and in vivo implant tests of plasma-polymerized para-xylene films

NASA Astrophysics Data System (ADS)

Chou, Chia-Man; Yeh, Chou-Ming; Chung, Chi-Jen; He, Ju-Liang

2013-09-01

Plasma-polymerized para-xylene (PPX) was developed in a previous study by adjusting the process parameters: pulse frequency of the power supply (ωp) and para-xylene monomer flow rate (fp). All the obtained PPX films exhibit an amorphous structure and present hydrophobicity (water contact angle ranging from 98.5° to 121.1°), higher film growth rate and good fibroblast cell proliferation. In this study, in vitro tests (fibroblast cell compatibility and platelet adhesion) and an in vivo animal study were performed by using PPX deposited industrial-grade silicone sheets (IGS) and compared with medical-grade silicone ones (MS), which were commonly manufactured into catheters or drainage tubes in clinical use. The results reveal that PPX deposited at high ωp or high fp, in comparison with MS, exhibit better cell proliferation and clearly shows less cell adhesion regardless of ωp and fp. PPX also exhibit a comparatively lower level of platelet adhesion than MS. In the animal study, PPX-coated IGS result in similar local tissue responses at 3, 7 and 28 days (short-term) and 84 days (long-term) after subcutaneous implantation the abdominal wall of rodents compared with respective responses to MS. These results suggest that PPX-coated industrial-grade silicone is one alternative to high cost medical-grade silicone.

Rotating Reverse-Osmosis for Water Purification

NASA Technical Reports Server (NTRS)

Lueptow, RIchard M.

2004-01-01

A new design for a water-filtering device combines rotating filtration with reverse osmosis to create a rotating reverse- osmosis system. Rotating filtration has been used for separating plasma from whole blood, while reverse osmosis has been used in purification of water and in some chemical processes. Reverse- osmosis membranes are vulnerable to concentration polarization a type of fouling in which the chemicals meant not to pass through the reverse-osmosis membranes accumulate very near the surfaces of the membranes. The combination of rotating filtration and reverse osmosis is intended to prevent concentration polarization and thereby increase the desired flux of filtered water while decreasing the likelihood of passage of undesired chemical species through the filter. Devices based on this concept could be useful in a variety of commercial applications, including purification and desalination of drinking water, purification of pharmaceutical process water, treatment of household and industrial wastewater, and treatment of industrial process water. A rotating filter consists of a cylindrical porous microfilter rotating within a stationary concentric cylindrical outer shell (see figure). The aqueous suspension enters one end of the annulus between the inner and outer cylinders. Filtrate passes through the rotating cylindrical microfilter and is removed via a hollow shaft. The concentrated suspension is removed at the end of the annulus opposite the end where the suspension entered.

Adhesion Improvement between Polyethylene and Aluminum Using Eco-Friendly Plasma Treatment

NASA Astrophysics Data System (ADS)

Popelka, Anton; Krupa, Igor; Novák, Igor; Ouederni, Mabrouk; Abdulaqder, Fatima; Al-Yazedi, Shrooq; Al-Gunaid, Taghreed; Al-Senani, Thuraya

Polyethylene (PE) belongs among the most widely used polymers in many industrial applications, such as in building, packaging or transport industry. Qatar is one of the largest producers of PE in the world. Composite laminates consisting of PE and metal materials, such as aluminum (Al) lead to an improvement of various mechanical and physical properties necessary for special applications in building industry. Aluminum composite panel (ACP) represents type of flat panel that consists of two thin aluminum sheets bonded to a non-aluminum core, often made from PE. ACPs are frequently used for external cladding or facades of buildings. The main problem relates the adhesion between both materials. In this research work the improvement of adhesion properties of composite laminates prepared from PE and Al using plasma treatment was investigated. This surface treatment led to the significantly increase of peel strength of PE-Al adhesive joints.

Thermal barrier coating life-prediction model development

NASA Technical Reports Server (NTRS)

Strangman, T. E.; Neumann, J.; Liu, A.

1986-01-01

The program focuses on predicting the lives of two types of strain-tolerant and oxidation-resistant thermal barrier coating (TBC) systems that are produced by commercial coating suppliers to the gas turbine industry. The plasma-sprayed TBC system, composed of a low-pressure plasma-spray (LPPS) or an argon shrouded plasma-spray (ASPS) applied oxidation resistant NiCrAlY or (CoNiCrAlY) bond coating and an air-plasma-sprayed yttria partially stabilized zirconia insulative layer, is applied by both Chromalloy, Klock, and Union Carbide. The second type of TBS is applied by the electron beam-physical vapor deposition (EB-PVD) process by Temescal. The second year of the program was focused on specimen procurement, TMC system characterization, nondestructive evaluation methods, life prediction model development, and TFE731 engine testing of thermal barrier coated blades. Materials testing is approaching completion. Thermomechanical characterization of the TBC systems, with toughness, and spalling strain tests, was completed. Thermochemical testing is approximately two-thirds complete. Preliminary materials life models for the bond coating oxidation and zirconia sintering failure modes were developed. Integration of these life models with airfoil component analysis methods is in progress. Testing of high pressure turbine blades coated with the program TBS systems is in progress in a TFE731 turbofan engine. Eddy current technology feasibility was established with respect to nondestructively measuring zirconia layer thickness of a TBC system.

Study of plasma off-gas treatment from spent ion exchange resin pyrolysis.

PubMed

Castro, Hernán Ariel; Luca, Vittorio; Bianchi, Hugo Luis

2017-03-23

Polystyrene divinylbenzene-based ion exchange resins are employed extensively within nuclear power plants (NPPs) and research reactors for purification and chemical control of the cooling water system. To maintain the highest possible water quality, the resins are regularly replaced as they become contaminated with a range of isotopes derived from compromised fuel elements as well as corrosion and activation products including 14 C, 60 Co, 90 Sr, 129 I, and 137 Cs. Such spent resins constitute a major proportion (in volume terms) of the solid radioactive waste generated by the nuclear industry. Several treatment and conditioning techniques have been developed with a view toward reducing the spent resin volume and generating a stable waste product suitable for long-term storage and disposal. Between them, pyrolysis emerges as an attractive option. Previous work of our group suggests that the pyrolysis treatment of the resins at low temperatures between 300 and 350 °C resulted in a stable waste product with a significant volume reduction (>50%) and characteristics suitable for long-term storage and/or disposal. However, another important issue to take into account is the complexity of the off-gas generated during the process and the different technical alternatives for its conditioning. Ongoing work addresses the characterization of the ion exchange resin treatment's off-gas. Additionally, the application of plasma technology for the treatment of the off-gas current was studied as an alternative to more conventional processes utilizing oil- or gas-fired post-combustion chambers operating at temperatures in excess of 1000 °C. A laboratory-scale flow reactor, using inductively coupled plasma, operating under sub-atmospheric conditions was developed. Fundamental experiments using model compounds have been performed, demonstrating a high destruction and removal ratio (>99.99%) for different reaction media, at low reactor temperatures and moderate power consumption. The role of H 2 O as an important participant of the oxidation mechanisms in plasma conditions was established. The combination of both processes could represent a simple, safe, and effective alternative for treating spent ion exchange resins with a large reduction of generated gaseous byproducts in fuel cycle facilities where processes that utilize open flames are undesirable.

Innovative UVC light (185 nm) and radio-frequency-plasma pretreatment of Nylon surfaces at atmospheric pressure and their implications in photocatalytic processes.

PubMed

Mejía, M I; Marín, J M; Restrepo, G; Pulgarín, C; Mielczarski, E; Mielczarski, J; Stolitchnov, I; Kiwi, J

2009-10-01

Innovative pretreatment by UVC light (185 nm) and by radio-frequency (RF) plasma at atmospheric pressure to functionalize the Nylon surface, increasing its bondability toward TiO(2), is reported in this study. In the case of UVC light pretreatment in air, the molar absorption coefficient of O(2)/N(2) at 185 nm is very low and the air in the chamber absorbs very little light from the UVC source before reaching the Nylon sample. Nylon fabrics under RF plasma were also functionalized at atmospheric pressure because of the marked heating effect introduced in the Nylon by the RF plasma. This effect leads to intermolecular bond breaking and oxygenated surface groups in the topmost Nylon layers. Both pretreatments enhanced significantly the photocatalytic discoloration of the red-wine stain in Nylon-TiO(2) compared with samples without pretreatment. The UVC and RF methods in the absence of vacuum imply a considerable cost reduction to functionalize textile surfaces, suggesting a potential industrial application. Red-wine-stain discoloration under simulated sunlight was monitored quantitatively by diffuse-reflectance spectroscopy and by CO(2) evolution. X-ray photoelectron spectroscopy (XPS) was used to monitor the changes of the C, N, and S species on the Nylon topmost layers during the discoloration process. Significant changes in the XPS spectra of Ti 2p peaks were observed during discoloration of the wine spots. Wine stains attenuated the signal of the Ti 2p (458.4 eV) peak in the Nylon-TiO(2)-stained wine sample at time zero (from now on, the time before the discoloration process). Furthermore, a decrease of the wine-related O 1s signal at 529.7 eV and N 1s signal at 399.5 eV was observed during the discoloration process, indicating an efficient catalytic decomposition of the wine pigment on Nylon-TiO(2). X-ray diffraction detected the formation of anatase on the Nylon fibers. High-resolution transmission electron microscopy shows the formation of anatase particles with sizes between 8 and 20 nm.

Two new planar coil designs for a high pressure radio frequency plasma source

NASA Astrophysics Data System (ADS)

Munsat, T.; Hooke, W. M.; Bozeman, S. P.; Washburn, S.

1995-04-01

Two planar coil designs for a high pressure rf plasma source are investigated using spectroscopic techniques and circuit analysis. In an Ar plasma a truncated version of the commonly used ``spiral'' coil is found to produce improvements in peak electron density of 20% over the full version. A coil with figure-8 geometry is found to move plasma inhomogeneities off of center and produce electron densities comparable to the spiral coils. Both of these characteristics are advantageous in industrial applications. Coil design characteristics for favorable power coupling are also determined, including the necessity of closed hydrodynamic plasma loops and the drawback of closely situated antiparallel coil currents.

Integrated gasification and plasma cleaning for waste treatment: A life cycle perspective

DOE Office of Scientific and Technical Information (OSTI.GOV)

Evangelisti, Sara; Tagliaferri, Carla; Advanced Plasma Power

2015-09-15

Highlights: • A life cycle assessment of an advanced two-stage process is undertaken. • A comparison of the impacts of the process when fed with 7 feedstock is presented. • Sensitivity analysis on the system is performed. • The treatment of RDF shows the lowest impact in terms of both GWP and AP. • The plasma shows a small contribution to the overall impact of the plant. - Abstract: In the past, almost all residual municipal waste in the UK was landfilled without treatment. Recent European waste management directives have promoted the uptake of more sustainable treatment technologies, especially formore » biodegradable waste. Local authorities have started considering other options for dealing with residual waste. In this study, a life cycle assessment of a future 20 MWe plant using an advanced two-stage gasification and plasma technology is undertaken. This plant can thermally treat waste feedstocks with different composition and heating value to produce electricity, steam and a vitrified product. The objective of the study is to analyse the environmental impacts of the process when fed with seven different feedstocks (including municipal solid waste, solid refuse fuel, reuse-derived fuel, wood biomass and commercial & industrial waste) and identify the process steps which contribute more to the environmental burden. A scenario analysis on key processes, such as oxygen production technology, metal recovery and the appropriate choice for the secondary market aggregate material, is performed. The influence of accounting for the biogenic carbon content in the waste from the calculations of the global warming potential is also shown. Results show that the treatment of the refuse-derived fuel has the lowest impact in terms of both global warming potential and acidification potential because of its high heating value. For all the other impact categories analysed, the two-stage gasification and plasma process shows a negative impact for all the waste streams considered, mainly due to the avoided burdens associated with the production of electricity from the plant. The plasma convertor, key characteristic of the thermal process investigated, although utilising electricity shows a relatively small contribution to the overall environmental impact of the plant. The results do not significantly vary in the scenario analysis. Accounting for biogenic carbon enhanced the performance of biomass and refuse-derived fuel in terms of global warming potential. The main analysis of this study has been performed from a waste management perspective, using 1 ton of waste as functional unit. A comparison of the results when 1 kWhe of electricity produced is used as functional unit shows similar trends for the environmental impact categories considered.« less

Estimation of the ionic charge of non-metallic species into an electrical discharge through a web application

NASA Astrophysics Data System (ADS)

Pérez Gutiérrez, B. R.; Vera-Rivera, F. H.; Niño, E. D. V.

2016-08-01

Estimate the ionic charge generated in electrical discharges will allow us to know more accurately the concentration of ions implanted on the surfaces of nonmetallic solids. For this reason, in this research a web application was developed to allow us to calculate the ionic charge generated in an electrical discharge from the experimental parameters established in an ion implantation process performed in the JUPITER (Joint Universal Plasma and Ion Technologies Experimental Reactor) reactor. The estimated value of the ionic charge will be determined from data acquired on an oscilloscope, during startup and shutdown of electrical discharge, which will then be analyzed and processed. The study will provide best developments with regard to the application of ion implantation in various industrial sectors.

Foundations of low-temperature plasma physics—an introduction

NASA Astrophysics Data System (ADS)

von Keudell, A.; Schulz-von der Gathen, V.

2017-11-01

The use of plasmas as a reactive mixture of ions, electrons and neutrals is at the core of numerous technologies in industry, enabling applications in microelectronics, automotives, packaging, environment and medicine. Recently, even the use of plasmas in medical applications has made great progress. The dominant character of a plasma is often its non equilibrium nature with different temperatures for the individual species in a plasma, the ions, electrons and neutrals. This opens up a multitude of reaction pathways which are inaccessible to conventional methods in chemistry, for example. The understanding of plasmas requires expertise in plasma physics, plasma chemistry and in electrical engineering. This first paper in a series of foundation papers on low temperature plasma science is intended to provide the very basics of plasmas as a common starting point for the more in-depth discussion of particular plasma generation methods, plasma modeling and diagnostics in the other foundation papers. In this first paper of the series, the common terminology, definitions and main concepts are introduced. The covered aspects start with the basic definitions and include further plasma equilibria, particle collisions and transport, sheaths and discharge breakdowns.

Plasma-enhanced synthesis of green flame retardant cellulosic materials

NASA Astrophysics Data System (ADS)

Totolin, Vladimir

The natural fiber-containing fabrics and composites are more environmentally friendly, and are used in transportation (automobiles, aerospace), military applications, construction industries (ceiling paneling, partition boards), consumer products, etc. Therefore, the flammability characteristics of the composites based on polymers and natural fibers play an important role. This dissertation presents the development of plasma assisted - green flame retardant coatings for cellulosic substrates. The overall objective of this work was to generate durable flame retardant treatment on cellulosic materials. In the first approach sodium silicate layers were pre-deposited onto clean cotton substrates and cross linked using low pressure, non-equilibrium oxygen plasma. A statistical design of experiments was used to optimize the plasma parameters. The modified cotton samples were tested for flammability using an automatic 45° angle flammability test chamber. Aging tests were conducted to evaluate the coating resistance during the accelerated laundry technique. The samples revealed a high flame retardant behavior and good thermal stability proved by thermo-gravimetric analysis. In the second approach flame retardant cellulosic materials have been produced using a silicon dioxide (SiO2) network coating. SiO 2 network armor was prepared through hydrolysis and condensation of the precursor tetraethyl orthosilicate (TEOS), prior coating the substrates, and was cross linked on the surface of the substrates using atmospheric pressure plasma (APP) technique. Due to protection effects of the SiO2 network armor, the cellulosic based fibers exhibit enhanced thermal properties and improved flame retardancy. In the third approach, the TEOS/APP treatments were extended to linen fabrics. The thermal analysis showed a higher char content and a strong endothermic process of the treated samples compared with control ones, indicating a good thermal stability. Also, the surface analysis proved the existence of the silica-based coatings on all treated cellulosic substrates after intense ultrasound washes. The results obtained in this work allow us to conclude that silica-based coatings used in conjunction with plasma processes have high potential to obtain green flame retardant cellulosic materials with potential applications in the development of upholstered furniture, clothing and military applications.

75 FR 75809 - Guidance for Industry: Use of Serological Tests To Reduce the Risk of Transmission of Trypanosoma...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-12-06

... of transmission of T. cruzi infection by detecting antibodies to T. cruzi in plasma and serum samples from individual human donors. The guidance document does not apply to the collection of source plasma...) for review and clearance under the Paperwork Reduction Act of 1995. DATES: Submit either electronic or...

77 FR 68133 - Guidance for Industry: Use of Nucleic Acid Tests on Pooled and Individual Samples From Donors of...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-15

... Blood and Blood Components, Including Source Plasma, To Reduce the Risk of Transmission of Hepatitis B... Components, including Source Plasma, to Reduce the Risk of Transmission of Hepatitis B Virus,'' dated October... (NAT) to screen blood donors for hepatitis B virus (HBV) deoxyribonucleic acid (DNA) and...

Refuse derived fuel (RDF) plasma torch gasification as a feasible route to produce low environmental impact syngas for the cement industry.

PubMed

López-Sabirón, Ana M; Fleiger, Kristina; Schäfer, Stefan; Antoñanzas, Javier; Irazustabarrena, Ane; Aranda-Usón, Alfonso; Ferreira, Germán A

2015-08-01

Plasma torch gasification (PTG) is currently researched as a technology for solid waste recovery. However, scientific studies based on evaluating its environmental implications considering the life cycle assessment (LCA) methodology are lacking. Therefore, this work is focused on comparing the environmental effect of the emissions of syngas combustion produced by refuse derived fuel (RDF) and PTG as alternative fuels, with that related to fossil fuel combustion in the cement industry. To obtain real data, a semi-industrial scale pilot plant was used to perform experimental trials on RDF-PTG.The results highlight that PTG for waste to energy recovery in the cement industry is environmentally feasible considering its current state of development. A reduction in every impact category was found when a total or partial substitution of alternative fuel for conventional fuel in the calciner firing (60 % of total thermal energy input) was performed. Furthermore, the results revealed that electrical energy consumption in PTG is also an important parameter from the LCA approach. © The Author(s) 2015.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2001-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2001-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discemible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2000-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2002-07-16

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Test of an argon cusp plasma for tin LPP power scaling

NASA Astrophysics Data System (ADS)

McGeoch, Malcolm W.

2015-03-01

Scaling the power of the tin droplet laser-produced-plasma (LPP) extreme ultraviolet (EUV) source to 500W has eluded the industry after a decade of effort. In 2014 we proposed [2] a solution: placing the laser-plasma interaction region within an argon plasma in a magnetic cusp. This would serve to ionize tin atoms and guide them to a large area annular beam dump. We have since demonstrated the feasibility of this approach. We present first results from a full-scale test plasma at power levels relevant to the generation of at least 200W, showing both that the argon cusp plasma is very stable, and that its geometrical properties are ideal for the transport of exhaust power and tin to the beam dump.

Electrochemical generation of sulfur vacancies in the basal plane of MoS2 for hydrogen evolution

PubMed Central

Tsai, Charlie; Li, Hong; Park, Sangwook; Park, Joonsuk; Han, Hyun Soo; Nørskov, Jens K.; Zheng, Xiaolin; Abild-Pedersen, Frank

2017-01-01

Recently, sulfur (S)-vacancies created on the basal plane of 2H-molybdenum disulfide (MoS2) using argon plasma exposure exhibited higher intrinsic activity for the electrochemical hydrogen evolution reaction than the edge sites and metallic 1T-phase of MoS2 catalysts. However, a more industrially viable alternative to the argon plasma desulfurization process is needed. In this work, we introduce a scalable route towards generating S-vacancies on the MoS2 basal plane using electrochemical desulfurization. Even though sulfur atoms on the basal plane are known to be stable and inert, we find that they can be electrochemically reduced under accessible applied potentials. This can be done on various 2H-MoS2 nanostructures. By changing the applied desulfurization potential, the extent of desulfurization and the resulting activity can be varied. The resulting active sites are stable under extended desulfurization durations and show consistent HER activity. PMID:28429782

Electrochemical generation of sulfur vacancies in the basal plane of MoS2 for hydrogen evolution

DOE PAGES

Tsai, Charlie; Li, Hong; Park, Sangwook; ...

2017-04-21

Recently, sulfur (S)-vacancies created on the basal plane of 2H-molybdenum disulfide (MoS 2) using argon plasma exposure exhibited higher intrinsic activity for the electrochemical hydrogen evolution reaction than the edge sites and metallic 1T-phase of MoS 2 catalysts. But, a more industrially viable alternative to the argon plasma desulfurization process is needed. In this work, we introduce a scalable route towards generating S-vacancies on the MoS 2 basal plane using electrochemical desulfurization. We found that they can be electrochemically reduced under accessible applied potentials, even though sulfur atoms on the basal plane are known to be stable and inert. Thismore » can be done on various 2H-MoS 2 nanostructures. Furthermore, by changing the applied desulfurization potential, the extent of desulfurization and the resulting activity can be varied. The resulting active sites are stable under extended desulfurization durations and show consistent HER activity.« less

Radicals and Non-Equilibrium Processes in Low-Temperature Plasmas

NASA Astrophysics Data System (ADS)

Petrović, Zoran; Mason, Nigel; Hamaguchi, Satoshi; Radmilović-Radjenović, Marija

2007-06-01

This volume is a selection from papers presented at the 5th EU - Japan Symposium. Unfortunately not all of the authors invited to prepare a review could finalize their papers in time for publication. Thus this book displays only a part of what has been enjoyed by the audience during the conference and what was expected to be in the book. On the other hand it provides the possibility to view some of the issues in greater detail and a chance for those who attended the meeting to revisit some of the presentations and discussion. The particular value of this symposia series is the opportunity for participants to discuss the issues confronting modern plasma physics and evolve a collaborative strategy to address these issues. The resulting synergism from having the leading researchers in this field all in the same room unfortunately could not be captured in this book but will certainly be reflected in the results presented at future symposia. The 29 invited lectures and 4 progress reports (with the addition of 10 posters) presented at the conference came from 12 different countries from 4 continents. A similar distribution is maintained in the 21 articles in this book. All the papers presented here have been refereed according to the standards of the conference and the journal, first by selecting the renowned invited speakers and selecting the topics of their presentations and later on by reviewing the articles. However we still leave the responsibility (and honors) for the contents of the papers to the authors. The papers in this book are review articles giving a summary of the already published work or presenting the work in progress that will be published in full at a later date (or both). The EU - Japan Symposia were initiated in 2003 and have been held in Japan and in Europe (so far only in European countries starting with the letter `S': Sweden, Slovakia, Serbia). The 5th EU - Japan Joint Symposium on Plasma Processing was organized in Belgrade, 6-9 March at the Serbian Academy of Sciences and Arts and Institute of Physics, Belgrade. Each Symposium has sought to highlight a key topic of plasma research and the 5th EU - Japan symposium explored the role of Radicals and Non-Equilibrium Processes in Low-Temperature Plasmas since these are key elements of plasma processing. Other aspects of technologies for manufacturing integrated circuits were also considered. Unlike bio-medicine and perhaps politics, in plasma processing free radicals are `good radicals' but their kinetics are difficult to understand since there remains little data on their collisions with electrons and ions. One of the goals of the symposium was to facilitate communication between experimentalists and theorists in binary collision physics with plasma modellers and practitioners of plasma processing in order to optimize efforts to provide much needed data for both molecules and radicals of practical importance. The non-equilibrium nature of plasmas is critical in the efficient manufacturing of high resolution structures by anisotropic plasma etching on Si wafers since they allow separate control of the directionality and energy of ions and provide a high level of separation between the mean energies of electrons and ions. As nanotechnologies become practical, plasma processing may play a key role, not only in manufacturing of integrated circuits, but also for self-organization of massively parallel manufacturing of nanostructures. In this Symposium the key issues that are hindering the development of such new, higher resolution technologies were discussed and some possible solutions were proposed. In particular, damage control, fast neutral etching, processes at surface and modeling of profiles were addressed in several of the lectures. A wide range of topics are covered in this book including atomic and molecular collision physics - primarily focused towards formation and analysis of radicals, basic swarm data and breakdown kinetics, basic kinetics of RF and DC discharges, plasma chemistry - particularly in oxygen containing plasmas, modeling of plasmas and plasma surface interactions in complex comprehensive plasma codes, modeling of the development of surface profiles and kinetics of surface collisions, plasma treatment of materials, plasma processing and applications in thin film deposition, nanoscale device production and many other applications. Yet all the papers, one way or the other, address the key issues of the next generation of plasma technologies in the micro and nano electronic industry. The issue of radicals and also of electron molecule collisions is addressed by J Tennyson who presents a guide into using a code for R-matrix calculations of electron-molecule collisions at low and intermediate energies. Related experimental results are presented by T Field who showed recent measurements of electron radical attachment cross sections, by T Märk who discusses electron impact ionization/dissociation of molecules and subsequent production of energetic radicals, and by M Kimura and his coauthors who discuss productions of radicals and ions by electron and photon impacts on CH4. Finally T Maddern and M Brunger share with us the first results from the new very complex system for comprehensive measurements of electron radical cross sections, the first example being CF2. B Marinković mainly focuses on recent results of his group having in mind the data needs for plasma modeling. Collisions at surfaces are addressed by P Tegeder and more specifically she presents here the evolution of negative ion resonances at surfaces. The electron swarm data as projected onto gaseous dielectrics but also having application in plasma processing is covered by J De Urquijo who attempted to answer the question whether CF3I is a better dielectric than SF6. The basic processes leading to the gas breakdown have been addressed by D Marić and Z Lj Petrović who focus on the transition from Townsend to constricted-normal glow regime while trying to project the recent results onto the standard Townsend theory and phenomenology. New developments in plasma diagnostics are given by U Czarnetzki who studies application of the plasma series resonance effect in RF-discharges and by J Röpcke who describes the recent progress in understanding kinetics of molecular plasmas using laser absorption techniques. Theoretical description of the two frequency operation of capacitively coupled plasmas in CF4 mixtures is provided by Z Donko. Different plasma sources are well covered. First S Popović discusses microwave discharges in oxygen and the role of the oxygen metastable, K Becker analyzes UV production in dielectric barrier discharges while K Tachibana and O Sakai show results on generation and applications of atmospheric pressure glow discharges by integration of microplasmas Plasma surface interactions are addressed from the viewpoint of the surface processes (etching of organic dielectrics and Si in particular) by S Hamaguchi while the recent numerical techniques in predicting 3D etched profiles are presented by B Radjenović who discusses coupling of the profile charging and the level set calculations in 3D profile evolution simulations. A detailed study of SiO2 etching in two frequency plasma is provided by F Hamaoka, T Yagisawa and T Makabe. Plasmas may not only be used in their destructive (etching) mode, they may be used to build (deposit) new materials or structures. Thus plasma assisted growth of ultrathin oxides and nitrides on Si surfaces for CMOS applications is described in the paper by P Morgen and coworkers while E Neyts et al discuss reaction mechanisms and thin a-C:H film growth from low energy hydrocarbon radicals. Finally M Shiratani describes control of nano-strucutures produced by plasma CVD films and its application in development of novel photovoltaic devices. Although the major applications discussed in this Symposium were related to nano-electronics, much of the basic research was relevant for the development of a wide range of other nano-technologies. The former is certainly well documented but the relevance of plasma processing for massively parallel self-organized manufacturing of nanostructures has yet to be proven. While, in stressing the importance of plasmas in nano-technologies we may sound like one of the seven blind men/women who went to India to `see' (observe) an elephant and each identified elephant with the part of its body that he/she was able to touch, but we still believe that plasma technologies will provide the possibility for transfer of a large number of bottom-up nano-technologies to the industrial environment. The results presented at this conference are therefore applicable to a broader range of nano-applications in future. During the Workshop, a round table discussion: `Network of Excellence between EU and Japan in the era of globalization' was organized. A strategy for further research and joint applications for funding was developed between the EU and Japanese groups, also involving collaborative research with groups from Australia and USA. We therefore believe that the symposium was one of the best aggregations of leading researchers in the field in the last few years and was a highly successful conference. While this volume cannot capture all that was going on at such a conference, we are still confident that it will prove to be a useful reference on numerous topical issues, a guide for young researchers into the scientific issues of this field and a reminder for the participants of the symposium itself and all the interactions they had with their colleagues. Most of the things that we observe exist in non-equilibrium and life is one of its manifestations. Our desire to predict and describe even these, very complex aspects of nature is an attempt to create and control non-equilibrium. Therefore we hope that our attempts, as described in this proceedings, which are focused on one aspect of nature that we understand very well, sometimes almost exactly, may put us in position ask some fundamental questions while contributing to the benefit of mankind. We are grateful to all the members of the Gaseous Electronics Laboratory for organization of the event, in particular the members of the organizing committee and the staff of the Academy of Science and Institute of Physics. Finally and above all we acknowledge the great efforts of all the participants who have invested a lot of funds, their time and effort to join us, sometimes travelling from distant continents. The conference was primarily supported by ESF Program Electron Induced Processing at the Molecular Level. Additional funding and facilities were provided by the COE Optical and Electronic Device Technology for Access Network (Keio University), Ministry of Science of the Republic of Serbia; Academy of Sciences and Arts of Serbia, Institute of Physics Belgrade, COE Nonequilibrium processes in plasma physics and environmental science and Hiden Analytical. Zoran L J Petrović, Nigel Mason, Satoshi Hamaguchi and Marija Radmilović-Radjenović Editors

Use of stable isotope signatures to determine mercury sources in the Great Lakes

USGS Publications Warehouse

Lepak, Ryan F.; Yin, Runsheng; Krabbenhoft, David P.; Ogorek, Jacob M.; DeWild, John F.; Holsen, Thomas M.; Hurley, James P.

2015-01-01

Sources of mercury (Hg) in Great Lakes sediments were assessed with stable Hg isotope ratios using multicollector inductively coupled plasma mass spectrometry. An isotopic mixing model based on mass-dependent (MDF) and mass-independent fractionation (MIF) (δ202Hg and Δ199Hg) identified three primary Hg sources for sediments: atmospheric, industrial, and watershed-derived. Results indicate atmospheric sources dominate in Lakes Huron, Superior, and Michigan sediments while watershed-derived and industrial sources dominate in Lakes Erie and Ontario sediments. Anomalous Δ200Hg signatures, also apparent in sediments, provided independent validation of the model. Comparison of Δ200Hg signatures in predatory fish from three lakes reveals that bioaccumulated Hg is more isotopically similar to atmospherically derived Hg than a lake’s sediment. Previous research suggests Δ200Hg is conserved during biogeochemical processing and odd mass-independent fractionation (MIF) is conserved during metabolic processing, so it is suspected even is similarly conserved. Given these assumptions, our data suggest that in some cases, atmospherically derived Hg may be a more important source of MeHg to higher trophic levels than legacy sediments in the Great Lakes.

Use of Iba Techniques to Characterize High Velocity Thermal Spray Coatings

NASA Astrophysics Data System (ADS)

Trompetter, W.; Markwitz, A.; Hyland, M.

Spray coatings are being used in an increasingly wide range of industries to improve the abrasive, erosive and sliding wear of machine components. Over the past decade industries have moved to the application of supersonic high velocity thermal spray techniques. These coating techniques produce superior coating quality in comparison to other traditional techniques such as plasma spraying. To date the knowledge of the bonding processes and the structure of the particles within thermal spray coatings is very subjective. The aim of this research is to improve our understanding of these materials through the use of IBA techniques in conjunction with other materials analysis techniques. Samples were prepared by spraying a widely used commercial NiCr powder onto substrates using a HVAF (high velocity air fuel) thermal spraying technique. Detailed analysis of the composition and structure of the power particles revealed two distinct types of particles. The majority was NiCr particles with a significant minority of particles composing of SiO2/CrO3. When the particles were investigated both as raw powder and in the sprayed coating, it was surprising to find that the composition of the coating meterial remained unchanged during the coating process despite the high velocity application.

Protocol for obtaining platelet-rich plasma (PRP), platelet-poor plasma (PPP), and thrombin for autologous use.

PubMed

Franco, Diogo; Franco, Talita; Schettino, Angélica Maria; Filho, João Medeiros Tavares; Vendramin, Fabiel Spani

2012-10-01

Plasma has been widely studied and used in many different situations to speed up healing with better tissue adherence and hemostasis. Research projects are now attempting to isolate platelet-rich plasma (PRP) and platelet-poor plasma (PPP), making better use of their properties, particularly during operations and for wounds that are slow to heal. In view of the wide diversity of industrial machines and extraction protocols, together with the variety of industrially produced biologic glues, this article suggests an option for obtaining PRP, PPP, and human thrombin for autologous use. A way of obtaining PRP, PPP, and thrombin is reproduced through a protocol defined and established by the authors. Autologous thrombin and plasma were obtained through the collection and successive centrifugation of ten whole blood samples, until the desired hemocomponents were isolated, followed by quantitative and qualitative analyses of the elements obtained. The mean platelet concentration obtained was 6.03 × 10(8) platelets/ml, with a mean thrombin concentration of 33.54 nM, both values compatible with reports in the literature when different protocols are applied. The protocol described is a good option for the preparation and application of PRP, PPP, and autologous thrombin, particularly as they can be obtained simultaneously, eliminating the possibilities of viral contamination and allergic reactions. Moreover, the cost of this procedure is low, it is easy to perform, and replicable. This journal requires that authors assign a level of evidence to each article.

Characterization of Modified Tapioca Starch in Atmospheric Argon Plasma under Diverse Humidity by FTIR Spectroscopy

NASA Astrophysics Data System (ADS)

Deeyai, P.; Suphantharika, M.; Wongsagonsup, R.; Dangtip, S.

2013-01-01

Tapioca is economical crop grown in Thailand and continues to be one of the major sources of starch. Nowadays, tapioca starch has been widely used in industrial applications, however the native form of starch has limited the applications. Thus scientists try to modify the properties of starch for increasing the stability of the granules, pastes to low pH, heat, and shear during the food process. We modify the tapioca starch by plasma treatment under an argon atmosphere. The degree of modification is determined by following water content in the starch granules. The tablet samples of native starch are also prepared and compared with the plasma treated starch. Before plasma treatment, the starch tablets are stored under three different relative humilities (RH) including 11%, 68%, and 78%RH, respectively. The samples are characterized using FTIR spectroscopy associated with the degree of cross-linking. The results show that the water molecules are engulfed into the starch structure in two ways, a tight bond and a weak absorption of water molecules which is represented at two wave number of 1630 cm-1 and 3272 cm-1, respectively. The degree of cross-linking can be identified from the relative intensity of these two peaks with the C—O—H peak at 993 cm-1. The results show that the degree of cross-linking increase in the plasma treated starch. The degree of cross-linking of the treated starch with high relative humidity is less than that of the treated starch with low relative humidity.

Two-temperature transport coefficients of SF{sub 6}–N{sub 2} plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Fei; Chen, Zhexin; Wu, Yi, E-mail: wuyic51@mail.xjtu.edu.cn

Sulfur hexafluoride (SF{sub 6}) is widely adopted in electric power industry, especially in high-voltage circuit breakers and gas-insulated switchgear. However, the use of SF{sub 6} is limited by its high liquidation temperature and high global warming potential. Recently, research shows SF{sub 6}–N{sub 2} mixture, which shows environmental friendliness and good electrical properties, may be a feasible substitute for pure SF{sub 6}. This paper is devoted to the calculation of and transport coefficients of SF{sub 6}–N{sub 2} mixture under both LTE (local thermodynamic equilibrium) and non-LTE condition. The two–temperature mass action law was used to determine the composition. The transport coefficientsmore » were calculated by classical Chapman–Enskog method simplified by Devoto. The thermophysical properties are presented for electron temperatures of 300–40 000 K, ratios of electron to heavy species temperature of 1–10 and N{sub 2} mole fraction of 0%–100% at atmospheric pressure. The ionization processes under both LTE and non-LTE have been discussed. The results show that deviations from local thermodynamic equilibrium significantly affect the properties of SF{sub 6}–N{sub 2} plasma, especially before the plasma is fully ionized. The different influence of N{sub 2} on properties for SF{sub 6}–N{sub 2} plasma in and out of LTE has been found. The results will serve as reliable reference data for computational simulation of the behavior of SF{sub 6}–N{sub 2} plasmas.« less

Magnesium Oxide (MgO) pH-sensitive Sensing Membrane in Electrolyte-Insulator-Semiconductor Structures with CF4 Plasma Treatment.

PubMed

Kao, Chyuan-Haur; Chang, Chia Lung; Su, Wei Ming; Chen, Yu Tzu; Lu, Chien Cheng; Lee, Yu Shan; Hong, Chen Hao; Lin, Chan-Yu; Chen, Hsiang

2017-08-03

Magnesium oxide (MgO) sensing membranes in pH-sensitive electrolyte-insulator-semiconductor structures were fabricated on silicon substrate. To optimize the sensing capability of the membrane, CF 4 plasma was incorporated to improve the material quality of MgO films. Multiple material analyses including FESEM, XRD, AFM, and SIMS indicate that plasma treatment might enhance the crystallization and increase the grain size. Therefore, the sensing behaviors in terms of sensitivity, linearity, hysteresis effects, and drift rates might be improved. MgO-based EIS membranes with CF 4 plasma treatment show promise for future industrial biosensing applications.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Ward, Pamela Denise Peardon; Stevenson, Joel O'Don

2002-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). Another aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system. A final aspect of the present invention relates to a network a plurality of plasma monitoring systems, including with remote capabilities (i.e., outside of the clean room).

Increased germination and growth rates of pea and Zucchini seed by FSG plasma

NASA Astrophysics Data System (ADS)

Khatami, Shohreh; Ahmadinia, Arash

2018-04-01

Recently, cold atmospheric plasma (CAP) with the unique bio-disinfection features is used in various fields of industry, medicine, and agriculture. The main objectives of this work were to design FSG plasma (a semi-automatic device) and investigate the effect of the cold plasma in the enhancement of the Pea and Zucchini seed germination. Plasma irradiation time was studied to obtain a proper condition for the germination enhancement of seeds. The growth rate was calculated by measuring length of root and stem and dry weight of plants treated by plasma. To investigate drought resistance of plants, all treated and untreated samples were kept in darkness without water for 48 h. From the experimental results, it could be confirmed both drought resistance and germination of seedlings increased after plasma was applied to seeds at 30 s, while seeds treated whiten 60 s showed a decrease in both germination rate and seedling growth.

Determination of Vanadium, Tin and Mercury in Atmospheric Particulate Matter and Cement Dust Samples by Direct Current Plasma Atomic Emission Spectrometry.

ERIC Educational Resources Information Center

Hindy, Kamal T.; And Others

1992-01-01

An atmospheric pollution study applies direct current plasma atomic emission spectrometry (DCP-AES) to samples of total suspended particulate matter collected in two industrial areas and one residential area, and cement dust collected near major cement factories. These samples were analyzed for vanadium, tin, and mercury. The results indicate the…

In-situ plasma processing to increase the accelerating gradients of SRF cavities

DOE PAGES

Doleans, Marc; Afanador, Ralph; Barnhart, Debra L.; ...

2015-12-31

A new in-situ plasma processing technique is being developed at the Spallation Neutron Source (SNS) to improve the performance of the cavities in operation. The technique utilizes a low-density reactive oxygen plasma at room temperature to remove top surface hydrocarbons. The plasma processing technique increases the work function of the cavity surface and reduces the overall amount of vacuum and electron activity during cavity operation; in particular it increases the field emission onset, which enables cavity operation at higher accelerating gradients. Experimental evidence also suggests that the SEY of the Nb surface decreases after plasma processing which helps mitigating multipactingmore » issues. This article discusses the main developments and results from the plasma processing R&D are presented and experimental results for in-situ plasma processing of dressed cavities in the SNS horizontal test apparatus.« less

Development of super-clean diesel engine and combustor using nonthermal plasma hybrid aftertreatment

NASA Astrophysics Data System (ADS)

Okubo, Masaaki

2015-10-01

One of important and successful environmental applications of atmospheric-pressure corona discharge or plasma is electrostatic precipitator (ESP), which have been widely used for coal- or oil-fired boilers in electric power plants and particulate matter control emitted from industries such as glass melting furnace system, etc. In the ESPs, steady high voltage is usually applied to a pair of electrodes (at least, one of these has sharp edge). Unsteady pulsed high voltage is often applied for the collection of high-resistivity particulate matter (PM) to avoid reverse corona phenomena which reduce the collection efficiency of the ESPs. It was found that unsteady high voltage can treat hazardous gaseous components (NOx, SOx, hydrocarbon, and CO, etc.) in the exhaust gas, and researches were shifted from PM removal to hazardous gases aftertreatment with unsteady corona discharge induced plasmas. In the paper, recent results on diesel engine and industrial boiler emission controls are mainly reviewed among these our research topics.

Use of recovered frying oils in chicken and rabbit feeds: effect on the fatty acid and tocol composition and on the oxidation levels of meat, liver and plasma.

PubMed

Tres, A; Bou, R; Guardiola, F; Nuchi, C D; Magrinyà, N; Codony, R

2013-03-01

The addition of some fat co- and by-products to feeds is usual nowadays; however, the regulations of their use are not always clear and vary between countries. For instance, the use of recycled cooking oils is not allowed in the European Union, but they are used in other countries. However, oils recovered from industrial frying processes could show satisfactory quality for this purpose. Here we studied the effects of including oils recovered from the frying industry in rabbit and chicken feeds (at 30 and 60 g/kg, respectively) on the fatty acid (FA) and tocol (tocopherol + tocotrienol) compositon of meat, liver and plasma, and on their oxidative stability. Three dietary treatments (replicated eight times) were compared: fresh non-used oil (LOX); oil discarded from the frying industry, having a high content of secondary oxidation compounds (HOX); and an intermediate level (MOX) obtained by mixing 50 : 50 of LOX and HOX. The FA composition of oil diets and tissues was assessed by GC, their tocol content by HPLC, the thiobarbituric acid value was used to assess tissue oxidation status, and the ferrous oxidation-xylenol orange method was used to assess the susceptibility of tissues to oxidation. Our results indicate that FA composition of rabbit and chicken meat, liver and plasma was scarcely altered by the addition of recovered frying oils to feed. Differences were encountered in the FA composition between species, which might be attributed mainly to differences in the FA digestion, absorption and metabolism between species, and to some physiological dietary factors (i.e. coprophagy in rabbits that involves fermentation with FA structure modification). The α-tocopherol (αT) content of tissues was reduced in response to the lower αT content in the recovered frying oil. Differences in the content of other tocols were encountered between chickens and rabbits, which might be attributable to the different tocol composition of their feeds, as well as to species differences in the digestion and metabolism of tocols. Tissue oxidation and susceptibility to oxidation were in general low and were not greatly affected by the degree of oxidation of the oil added to the feeds. The relative content of polyunsaturated fatty acids/αT in these types of samples would explain the differences observed between species in the susceptibility of each tissue to oxidation. According to our results, oils recovered from the frying industry could be useful for feed uses.

Plasma Discharge Process in a Pulsed Diaphragm Discharge System

NASA Astrophysics Data System (ADS)

Duan, Jianjin; Hu, Jue; Zhang, Chao; Wen, Yuanbin; Meng, Yuedong; Zhang, Chengxu

2014-12-01

As one of the most important steps in wastewater treatment, limited study on plasma discharge process is a key challenge in the development of plasma applications. In this study, we focus on the plasma discharge process of a pulsed diaphragm discharge system. According to the analysis, the pulsed diaphragm discharge proceeds in seven stages: (1) Joule heating and heat exchange stage; (2) nucleated site formation; (3) plasma generation (initiation of the breakdown stage); (4) avalanche growth and plasma expansion; (5) plasma contraction; (6) termination of the plasma discharge; and (7) heat exchange stage. From this analysis, a critical voltage criterion for breakdown is obtained. We anticipate this finding will provide guidance for a better application of plasma discharges, especially diaphragm plasma discharges.

Discontinuous model with semi analytical sheath interface for radio frequency plasma

NASA Astrophysics Data System (ADS)

Miyashita, Masaru

2016-09-01

Sumitomo Heavy Industries, Ltd. provide many products utilizing plasma. In this study, we focus on the Radio Frequency (RF) plasma source by interior antenna. The plasma source is expected to be high density and low metal contamination. However, the sputtering the antenna cover by high energy ion from sheath voltage still have been problematic. We have developed the new model which can calculate sheath voltage wave form in the RF plasma source for realistic calculation time. This model is discontinuous that electronic fluid equation in plasma connect to usual passion equation in antenna cover and chamber with semi analytical sheath interface. We estimate the sputtering distribution based on calculated sheath voltage waveform by this model, sputtering yield and ion energy distribution function (IEDF) model. The estimated sputtering distribution reproduce the tendency of experimental results.

Filters for cathodic arc plasmas

DOEpatents

Anders, Andre; MacGill, Robert A.; Bilek, Marcela M. M.; Brown, Ian G.

2002-01-01

Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

Plasma technologies application for building materials surface modification

NASA Astrophysics Data System (ADS)

Volokitin, G. G.; Skripnikova, N. K.; Volokitin, O. G.; Shehovtzov, V. V.; Luchkin, A. G.; Kashapov, N. F.

2016-01-01

Low temperature arc plasma was used to process building surface materials, such as silicate brick, sand lime brick, concrete and wood. It was shown that building surface materials modification with low temperature plasma positively affects frost resistance, water permeability and chemical resistance with high adhesion strength. Short time plasma processing is rather economical than traditional processing thermic methods. Plasma processing makes wood surface uniquely waterproof and gives high operational properties, dimensional and geometrical stability. It also increases compression resistance and decreases inner tensions level in material.

Plasma chemistry study of PLAD processes

DOE Office of Scientific and Technical Information (OSTI.GOV)

Qin Shu; Brumfield, Kyle; Liu, Lequn Jennifer

2012-11-06

Plasma doping (PLAD) shows very different impurity profiles compared to the conventional beam-line-based ion implantations due to its non-mass separation property and plasma environment. There is no simulation for PLAD process so far due to a lack of a dopant profile model. Several factors determine impurity profiles of PLAD process. The most significant factors are: plasma chemistry and deposition/etching characteristics of multi-ion species plasmas. In this paper, we present plasma chemistry and deposition/etching characteristics of PLAD processes versus co-gas dilutions. Four dopant plasmas including B{sub 2}H{sub 6}, BF{sub 3}, AsH{sub 3}, and PH{sub 3}, and two non-dopant plasmas including CH{submore » 4} and GeH{sub 4} are studied and demonstrated.« less

Reconfigurable antenna using plasma reflector

NASA Astrophysics Data System (ADS)

Jusoh, Mohd Taufik; Ahmad, Khairol Amali; Din, Muhammad Faiz Md; Hashim, Fakroul Ridzuan

2018-02-01

This paper presents the feasibility study and design of plasma implementation in industrial, scientific and medical (ISM) communication band. A reflector antenna with rounded shaped is proposed to collimate beam in particular direction radiated by a quarter wave antenna operating at 2.4GHz. The simulations result has shown that by using plasma as the reflector elements, the gain, directivity and radiation patterns are identical with metal elements with only small different in the broadside direction. The versatility of the antenna is achievable by introducing electrical reconfigurable option to change the beam pattern.

21 CFR 640.54 - Processing.

Code of Federal Regulations, 2010 CFR

2010-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

21 CFR 640.54 - Processing.

Code of Federal Regulations, 2012 CFR

2012-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

21 CFR 640.54 - Processing.

Code of Federal Regulations, 2011 CFR

2011-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

21 CFR 640.54 - Processing.

Code of Federal Regulations, 2013 CFR

2013-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

21 CFR 640.54 - Processing.

Code of Federal Regulations, 2014 CFR

2014-04-01

... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

Plasma, The Fourth State of Matter

ERIC Educational Resources Information Center

Zandy, Hassan F.

1970-01-01

Discusses plasma as a source of energy through nuclear fission processes, as well as the difficulties encountered in such a process. States that 99 percent of the matter in the universe is plasma, and only 1 percent is the common three states of matter. Describes the fundamental properties of plasma, plasma "pinch, and plasma oscillations. (RR)

Investigating the Detrimental Effects of Low Pressure Plasma Sterilization on the Survival of Bacillus subtilis Spores Using Live Cell Microscopy.

PubMed

Fuchs, Felix M; Raguse, Marina; Fiebrandt, Marcel; Madela, Kazimierz; Awakowicz, Peter; Laue, Michael; Stapelmann, Katharina; Moeller, Ralf

2017-11-30

Plasma sterilization is a promising alternative to conventional sterilization methods for industrial, clinical, and spaceflight purposes. Low pressure plasma (LPP) discharges contain a broad spectrum of active species, which lead to rapid microbial inactivation. To study the efficiency and mechanisms of sterilization by LPP, we use spores of the test organism Bacillus subtilis because of their extraordinary resistance against conventional sterilization procedures. We describe the production of B. subtilis spore monolayers, the sterilization process by low pressure plasma in a double inductively coupled plasma reactor, the characterization of spore morphology using scanning electron microscopy (SEM), and the analysis of germination and outgrowth of spores by live cell microscopy. A major target of plasma species is genomic material (DNA) and repair of plasma-induced DNA lesions upon spore revival is crucial for survival of the organism. Here, we study the germination capacity of spores and the role of DNA repair during spore germination and outgrowth after treatment with LPP by tracking fluorescently-labelled DNA repair proteins (RecA) with time-resolved confocal fluorescence microscopy. Treated and untreated spore monolayers are activated for germination and visualized with an inverted confocal live cell microscope over time to follow the reaction of individual spores. Our observations reveal that the fraction of germinating and outgrowing spores is dependent on the duration of LPP-treatment reaching a minimum after 120 s. RecA-YFP (yellow fluorescence protein) fluorescence was detected only in few spores and developed in all outgrowing cells with a slight elevation in LPP-treated spores. Moreover, some of the vegetative bacteria derived from LPP-treated spores showed an increase in cytoplasm and tended to lyse. The described methods for analysis of individual spores could be exemplary for the study of other aspects of spore germination and outgrowth.

Feasibility Study for a Plasma Dynamo Facility to Investigate Fundamental Processes in Plasma Astrophysics. Final report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Forest, Cary B.

The scientific equipment purchased on this grant was used on the Plasma Dynamo Prototype Experiment as part of Professor Forest's feasibility study for determining if it would be worthwhile to propose building a larger plasma physics experiment to investigate various fundamental processes in plasma astrophysics. The initial research on the Plasma Dynamo Prototype Experiment was successful so Professor Forest and Professor Ellen Zweibel at UW-Madison submitted an NSF Major Research Instrumentation proposal titled "ARRA MRI: Development of a Plasma Dynamo Facility for Experimental Investigations of Fundamental Processes in Plasma Astrophysics." They received funding for this project and the Plasma Dynamomore » Facility also known as the "Madison Plasma Dynamo Experiment" was constructed. This experiment achieved its first plasma in the fall of 2012 and U.S. Dept. of Energy Grant No. DE-SC0008709 "Experimental Studies of Plasma Dynamos," now supports the research.« less

Comparison of the Detection Characteristics of Trace Species Using Laser-Induced Breakdown Spectroscopy and Laser Breakdown Time-of-Flight Mass Spectrometry

PubMed Central

Wang, Zhenzhen; Deguchi, Yoshihiro; Yan, Junjie; Liu, Jiping

2015-01-01

The rapid and precise element measurement of trace species, such as mercury, iodine, strontium, cesium, etc. is imperative for various applications, especially for industrial needs. The elements mercury and iodine were measured by two detection methods for comparison of the corresponding detection features. A laser beam was focused to induce plasma. Emission and ion signals were detected using laser-induced breakdown spectroscopy (LIBS) and laser breakdown time-of-flight mass spectrometry (LB-TOFMS). Multi-photon ionization and electron impact ionization in the plasma generation process can be controlled by the pressure and pulse width. The effect of electron impact ionization on continuum emission, coexisting molecular and atomic emissions became weakened in low pressure condition. When the pressure was less than 1 Pa, the plasma was induced by laser dissociation and multi-photon ionization in LB-TOFMS. According to the experimental results, the detection limits of mercury and iodine in N2 were 3.5 ppb and 60 ppb using low pressure LIBS. The mercury and iodine detection limits using LB-TOFMS were 1.2 ppb and 9.0 ppb, which were enhanced due to different detection features. The detection systems of LIBS and LB-TOFMS can be selected depending on the condition of each application. PMID:25769051

Thermal barrier coating life-prediction model development. Annual report no. 2

DOE Office of Scientific and Technical Information (OSTI.GOV)

Strangman, T. E.; Neumann, J.; Liu, A.

1986-10-01

The program focuses on predicting the lives of two types of strain-tolerant and oxidation-resistant thermal barrier coating (TBC) systems that are produced by commercial coating suppliers to the gas turbine industry. The plasma-sprayed TBC system, composed of a low-pressure plasma-spray (LPPS) or an argon shrouded plasma-spray (ASPS) applied oxidation resistant NiCrAlY or (CoNiCrAlY) bond coating and an air-plasma-sprayed yttria partially stabilized zirconia insulative layer, is applied by both Chromalloy, Klock, and Union Carbide. The second type of TBS is applied by the electron beam-physical vapor deposition (EB-PVD) process by Temescal. The second year of the program was focused on specimenmore » procurement, TMC system characterization, nondestructive evaluation methods, life prediction model development, and TFE731 engine testing of thermal barrier coated blades. Materials testing is approaching completion. Thermomechanical characterization of the TBC systems, with toughness, and spalling strain tests, was completed. Thermochemical testing is approximately two-thirds complete. Preliminary materials life models for the bond coating oxidation and zirconia sintering failure modes were developed. Integration of these life models with airfoil component analysis methods is in progress. Testing of high pressure turbine blades coated with the program TBS systems is in progress in a TFE731 turbofan engine. Eddy current technology feasibility was established with respect to nondestructively measuring zirconia layer thickness of a TBC system.« less

Lightweight Portable Plasma Medical Device - Plasma Engineering Research Laboratory

DTIC Science & Technology

2012-10-01

cut fruit surfaces contaminated with migrating microorganisms," Journal of Food Protection, vol. 71, pp. 1619-1625, Aug 2008. [31] H. L. Chen, et...foodborne and opportunistic nosocomial pathogens is a major problem in food industry, biomedical and hospital applications, respectively. The resistive...source is very efficient in decontaminating wide range of infection and contamination causing bacteria. The direct and indirect exposure of the RBP

Preliminary results on complex ceramic layers deposition by atmospheric plasma spraying

NASA Astrophysics Data System (ADS)

Florea, Costel; Bejinariu, Costicǎ; Munteanu, Corneliu; Cimpoeşu, Nicanor

2017-04-01

In this article we obtain thin layers from complex ceramic powders using industrial equipment based on atmospheric plasma spraying. We analyze the influence of the substrate material roughness on the quality of the thin layers using scanning electron microscopy (SEM) and X-ray dispersive energy analyze (EDAX). Preliminary results present an important dependence between the surface state and the structural and chemical homogeneity.

Automated plasma control with optical emission spectroscopy

NASA Astrophysics Data System (ADS)

Ward, P. P.

Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to predict and control. Non-uniformity of most plasma processes and sensitivity to environmental changes make it difficult to maintain process stability from day to day. To assure plasma process performance, weight loss coupons or post-plasma destructive testing must be used. These techniques are not real-time methods however, and do not allow for immediate diagnosis and process correction. These tests often require scrapping some fraction of a batch to insure the integrity of the rest. Since these tests verify a successful cycle with post-plasma diagnostics, poor test results often determine that a batch is substandard and the resulting parts unusable. These tests are a costly part of the overall fabrication cost. A more efficient method of testing would allow for constant monitoring of plasma conditions and process control. Process anomalies should be detected and corrected before the parts being treated are damaged. Real time monitoring would allow for instantaneous corrections. Multiple site monitoring would allow for process mapping within one system or simultaneous monitoring of multiple systems. Optical emission spectroscopy conducted external to the plasma apparatus would allow for this sort of multifunctional analysis without perturbing the glow discharge. In this paper, optical emission spectroscopy for non-intrusive, in situ process control will be explored along with applications of this technique to for process control, failure analysis and endpoint determination in PWB manufacture.

In-line process control for laser welding of titanium by high dynamic range ratio pyrometry and plasma spectroscopy

NASA Astrophysics Data System (ADS)

Lempe, B.; Taudt, C.; Baselt, T.; Rudek, F.; Maschke, R.; Basan, F.; Hartmann, P.

2014-02-01

The production of complex titanium components for various industries using laser welding processes has received growing attention in recent years. It is important to know whether the result of the cohesive joint meets the quality requirements of standardization and ultimately the customer requirements. Erroneous weld seams can have fatal consequences especially in the field of car manufacturing and medicine technology. To meet these requirements, a real-time process control system has been developed which determines the welding quality through a locally resolved temperature profile. By analyzing the resulting weld plasma received data is used to verify the stability of the laser welding process. The determination of the temperature profile is done by the detection of the emitted electromagnetic radiation from the material in a range of 500 nm to 1100 nm. As detectors, special high dynamic range CMOS cameras are used. As the emissivity of titanium depends on the wavelength, the surface and the angle of radiation, measuring the temperature is a problem. To solve these a special pyrometer setting with two cameras is used. That enables the compensation of these effects by calculating the difference between the respective pixels on simultaneously recorded images. Two spectral regions with the same emissivity are detected. Therefore the degree of emission and surface effects are compensated and canceled out of the calculation. Using the spatially resolved temperature distribution the weld geometry can be determined and the laser process can be controlled. The active readjustment of parameters such as laser power, feed rate and inert gas injection increases the quality of the welding process and decreases the number of defective goods.

Monitoring the fate and behavior of TiO2 nanoparticles: Simulated in a WWTP with industrial dye-stuff effluent according to OECD 303A.

PubMed

Mahlalela, Lwazi C; Ngila, Jane C; Dlamini, Langelihle N

2017-07-03

The use of nanoparticles (NPs) in several consumer products has led to them finding their way into wastewater treatment plants (WWTPs). Some of these NPs have photocatalytic properties, thus providing a possible solution to textile industries to photodegrade dyes from their wastewater. Thus, the interaction of NPs with industrial dye effluents is inevitable. The Organization for Economic Co-operation and development (OECD) guideline for testing of chemical 303A was employed to study the fate and behaviour of TiO 2 NPs in industrial dye-stuff effluent. This was due to the unavailability of NPs' fate and behaviour test protocols. The effect of TiO 2 NPs on the treatment process was ascertained by measuring chemical oxygen demand (COD) and 5-day biological oxygen demand (BOD5). Inductively coupled plasma optical emission spectroscopy (ICP-OES) was used to study the fate and behavior of TiO 2 NPs. Acclimatization of bacteria to target pollutants was a crucial factor for the treatment efficiency of activated sludge in a simulated wastewater treatment plant (SWTP). The acclimatization of the activated sludge to the synthetic industrial dye-stuff effluent was successfully achieved. Effect of TiO 2 NPs on the treatment process efficiency was then investigated. Addition of TiO 2 NPs had no effect on the treatment process as chemical oxygen demand (COD) removal remained >80%. Measured total plate count (TPC) affirmed that the addition of TiO 2 NPs had no effect on the treatment process. The removal of total nitrogen (TN) was not efficient as the treatment system was required to have an oxic and anoxic stage for efficient TN removal. Results from X-ray powder diffraction (XRD) confirmed that the anatase phase of the added TiO 2 NPs remained unchanged even after exposure to the treatment plant. Removal of the NPs from the influent was facilitated by biosorption of the NPs on the activated sludge. Nanoparticles received by wastewater treatment plants will therefore reach the environment through sludge waste dumped in landfill. About 90% of TiO 2 was retained in the activated sludge, and 10-11% escaped with the treated effluents. Scanning electron microscope (SEM) mapping micrographs together with an energy dispersive X-ray spectroscopy (EDS) confirmed the presence of Ti in the sludge.

Axial distribution of plasma fluctuations, plasma parameters, deposition rate and grain size during copper deposition

NASA Astrophysics Data System (ADS)

Gopikishan, S.; Banerjee, I.; Pathak, Anand; Mahapatra, S. K.

2017-08-01

Floating potential fluctuations, plasma parameters and deposition rate have been investigated as a function of axial distance during deposition of copper in direct current (DC) magnetron sputtering system. Fluctuations were analyzed using phase space, power spectra and amplitude bifurcation plots. It has been observed that the fluctuations are modified from chaotic to ordered state with increase in the axial distance from cathode. Plasma parameters such as electron density (ne), electron temperature (Te) and deposition rate (Dr) were measured and correlated with plasma fluctuations. It was found that more the deposition rate, greater the grain size, higher the electron density, higher the electron temperature and more chaotic the oscillations near the cathode. This observation could be helpful to the thin film technology industry to optimize the required film.

Plasma Properties of an Exploding Semiconductor Igniter

NASA Astrophysics Data System (ADS)

McGuirk, J. S.; Thomas, K. A.; Shaffer, E.; Malone, A. L.; Baginski, T.; Baginski, M. E.

1997-11-01

Requirements by the automotive industry for low-cost, pyrotechnic igniters for automotive airbags have led to the development of several semiconductor devices. The properties of the plasma produced by the vaporization of an exploding semiconductor are necessary in order to minimize the electrical energy requirements. This work considers two silicon-based semiconductor devices: the semiconductor bridge (SCB) and the semiconductor junction igniter both consisting of etched silicon with vapor deposited aluminum structures. Electrical current passing through the device heats a narrow junction region to the point of vaporization creating an aluminum and silicon low-temperature plasma. This work will investigate the electrical characteristics of both devices and infer the plasma properties. Furthermore optical spectral measurements will be taken of the exploding devices to estimate the temperature and density of the plasma.

Comparative study between chemical and atmospheric pressure plasma jet cleaning on glass substrate

NASA Astrophysics Data System (ADS)

Elfa, Rizan Rizon; Ahmad, Mohd Khairul; Fhong, Soon Chin; Sahdan, Mohd Zainizan; Nayan, Nafarizal

2017-01-01

The atmospheric pressure plasma jet with low frequency and argon as working gas is presented in this paper to demonstrate its application for glass substrate clean and modification. The glass substrate clean by atmospheric pressure plasma jet is an efficient method to replace other substrate clean method. A comparative analysis is done in this paper between substrate cleaned by chemical and plasma treatment methods. Water contact angle reading is taken for a different method of substrate clean and period of treatment. Under the plasma treatment, the sample shows low surface adhesion due to having the surface property of super hydrophilic surface 7.26°. This comparative analysis is necessary in the industrial application for cost production due to sufficient time and method of substrate clean.

Ion-substituted calcium phosphate coatings deposited by plasma-assisted techniques: A review.

PubMed

Graziani, Gabriela; Bianchi, Michele; Sassoni, Enrico; Russo, Alessandro; Marcacci, Maurilio

2017-05-01

One of the main critical aspects behind the failure or success of an implant resides in its ability to fast bond with the surrounding bone. To boost osseointegration, the ideal implant material should exhibit composition and structure similar to those of biological apatite. To this aim, the most common approach is to coat the implant surface with a coating of hydroxyapatite (HA), resembling the main component of mineralized tissues. However, bone apatite is a non-stoichiometric, multi-substituted poorly-crystalline apatite, containing significant amounts of foreign ions, with high biological relevance. Ion-substituted HAs can be deposited by so called "wet methods", which are however poorly reproducible and hardly industrially feasible; at the same time bioactive coatings realized by plasma assisted method, interesting for industrial applications, are generally made of stoichiometric (i.e. un-substituted) HA. In this work, the literature concerning plasma-assisted deposition methods used to deposit ion-substituted HA was reviewed and the last advances in this field discussed. The ions taken into exam are those present in mineralized tissues and possibly having biological relevance. Notably, literature about this topic is scarce, especially relating to in vivo animal and clinical trials; further on, available studies evaluate the performance of substituted coatings from different points of view (mechanical properties, bone growth, coating dissolution, etc.) which hinders a proper evaluation of the real efficacy of ion-doped HA in promoting bone regeneration, compared to stoichiometric HA. Moreover, results obtained for plasma sprayed coatings (which is the only method currently employed for deposition at the industrial scale) were collected and compared to those of novel plasma-assisted techniques, that are expected to overcome its limitations. Data so far available on the topic were discussed to highlight advantages, limitations and possible perspectives of these procedures. Copyright © 2016 Elsevier B.V. All rights reserved.

High-performance low-cost back-channel-etch amorphous gallium-indium-zinc oxide thin-film transistors by curing and passivation of the damaged back channel.

PubMed

Park, Jae Chul; Ahn, Seung-Eon; Lee, Ho-Nyeon

2013-12-11

High-performance, low-cost amorphous gallium-indium-zinc oxide (a-GIZO) thin-film-transistor (TFT) technology is required for the next generation of active-matrix organic light-emitting diodes. A back-channel-etch structure is the most appropriate device structure for high-performance, low-cost a-GIZO TFT technology. However, channel damage due to source/drain etching and passivation-layer deposition has been a critical issue. To solve this problem, the present work focuses on overall back-channel processes, such as back-channel N2O plasma treatment, SiOx passivation deposition, and final thermal annealing. This work has revealed the dependence of a-GIZO TFT characteristics on the N2O plasma radio-frequency (RF) power and frequency, the SiH4 flow rate in the SiOx deposition process, and the final annealing temperature. On the basis of these results, a high-performance a-GIZO TFT with a field-effect mobility of 35.7 cm(2) V(-1) s(-1), a subthreshold swing of 185 mV dec(-1), a switching ratio exceeding 10(7), and a satisfactory reliability was successfully fabricated. The technology developed in this work can be realized using the existing facilities of active-matrix liquid-crystal display industries.

Magnetic filter apparatus and method for generating cold plasma in semicoductor processing

DOEpatents

Vella, Michael C.

1996-01-01

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.

Magnetic filter apparatus and method for generating cold plasma in semiconductor processing

DOEpatents

Vella, M.C.

1996-08-13

Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a ``cold plasma`` which is diffused in the region of the process surface while the ion implantation process takes place. 15 figs.

Determination of toxic inorganic elements pollution in ground waters of Kahuta Industrial Triangle Islamabad, Pakistan using inductively coupled plasma mass spectrometry.

PubMed

Kausar, Rubina; Ahmad, Zulfiqar

2009-10-01

The present study deals with the ground water quality assessment in Kahuta Industrial Triangle Islamabad, Pakistan. The objective of the study was to assess ground water quality against the drinking water standards for various toxic inorganic elements. Representative groundwater samples were collected and analyzed in the Water Quality Laboratory of Pakistan Council of Research in Water Resources (PCRWR) at Islamabad, Pakistan. The samples were run on ICP-MS (Inductively coupled plasma mass spectrometry), which has the capability to separate and quantify 70 elements at a time. One of the finding of study is that ICP-MS is a very good tool to analyze broad range of toxic inorganic elements to the level of parts per billion (ppb). World Health Organization drinking water standards shows that these toxic inorganic elements such as heavy metals even at this concentration level (ppb) are injurious to human health. This analysis indicated pollution of various toxic elements including Selenium. Vertical leachate through industrial waste septic tanks is identified as major cause of groundwater pollution in the Industrial Triangle. Monitoring of the septic tanks and groundwater quality in study area is suggested along with remedial measures.

Electron-Driven Processes: From Single Collision Experiments to High-Pressure Discharge Plasmas

NASA Astrophysics Data System (ADS)

Becker, Kurt

2001-10-01

Plasmas are complex systems which consist of various groups of interacting particles (neutral atoms and molecules in their ground states and in excite states, electrons, and positive and negative ions). In principle, one needs to understand and describe all interactions between these particles in order to model the properties of the plasma and to predict its behavior. However, two-body interactions are often the only processes of relevance and only a subset of all possible collisional interactions are important. The focus of this talk is on collisional and radiative processes in low-temperature plasmas, both at low and high pressures. We will limit the discussion (i) to ionization and dissociation processes in molecular low-pressure plasmas and (ii) to collisional and radiative processes in high-pressure plasmas in rare gases and mixtures of rare gases and N2, O2, and H2. Electron-impact dissociation processes can be divided into dissociative excitation and dissociation into neutral ground-state fragments. Neutral molecular dissociation has only recently received attention from experimentalists and theorists because of the serious difficulties associated with the investigation of these processes. Collisional and radiative processes in high-pressure plasmas provide a fertile environment to the study of interactions that go beyond binary collisions involving ground-state species. Step-wise processes and three-body collisions begin to dominate the behavior of such plasmas. We will discuss examples of such processes as they relate to high-pressure rare gas discharge plasmas. Work supported by NSF, DOE, DARPA, NASA, and ABA Inc.

40 CFR 98.98 - Definitions.

Code of Federal Regulations, 2013 CFR

2013-07-01

... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

40 CFR 98.98 - Definitions.

Code of Federal Regulations, 2012 CFR

2012-07-01

... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

40 CFR 98.98 - Definitions.

Code of Federal Regulations, 2014 CFR

2014-07-01

... definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production chambers... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

Plasma process control with optical emission spectroscopy

NASA Astrophysics Data System (ADS)

Ward, P. P.

Plasma processes for cleaning, etching and desmear of electronic components and printed wiring boards (PWB) are difficult to predict and control. Non-uniformity of most plasma processes and sensitivity to environmental changes make it difficult to maintain process stability from day to day. To assure plasma process performance, weight loss coupons or post-plasma destructive testing must be used. The problem with these techniques is that they are not real-time methods and do not allow for immediate diagnosis and process correction. These methods often require scrapping some fraction of a batch to insure the integrity of the rest. Since these methods verify a successful cycle with post-plasma diagnostics, poor test results often determine that a batch is substandard and the resulting parts unusable. Both of these methods are a costly part of the overall fabrication cost. A more efficient method of testing would allow for constant monitoring of plasma conditions and process control. Process failures should be detected before the parts being treated. are damaged. Real time monitoring would allow for instantaneous corrections. Multiple site monitoring would allow for process mapping within one system or simultaneous monitoring of multiple systems. Optical emission spectroscopy conducted external to the plasma apparatus would allow for this sort of multifunctional analysis without perturbing the glow discharge. In this paper, optical emission spectroscopy for non-intrusive, in situ process control will be explored. A discussion of this technique as it applies towards process control, failure analysis and endpoint determination will be conducted. Methods for identifying process failures, progress and end of etch back and desmear processes will be discussed.

Planar controlled zone microwave plasma system

DOEpatents

Ripley, Edward B [Knoxville, TN; Seals, Roland D [Oak Ridge, TN; Morrell, Jonathan S [Knoxvlle, TN

2011-10-04

An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

Controlled zone microwave plasma system

DOEpatents

Ripley, Edward B [Knoxville, TN; Seals, Roland D [Oak Ridge, TN; Morrell, Jonathan S [Knoxville, TN

2009-10-20

An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

Monitoring non-thermal plasma processes for nanoparticle synthesis

NASA Astrophysics Data System (ADS)

Mangolini, Lorenzo

2017-09-01

Process characterization tools have played a crucial role in the investigation of dusty plasmas. The presence of dust in certain non-thermal plasma processes was first detected by laser light scattering measurements. Techniques like laser induced particle explosive evaporation and ion mass spectrometry have provided the experimental evidence necessary for the development of the theory of particle nucleation in silane-containing non-thermal plasmas. This review provides first a summary of these early efforts, and then discusses recent investigations using in situ characterization techniques to understand the interaction between nanoparticles and plasmas. The advancement of such monitoring techniques is necessary to fully develop the potential of non-thermal plasmas as unique materials synthesis and processing platforms. At the same time, the strong coupling between materials and plasma properties suggest that it is also necessary to advance techniques for the measurement of plasma properties while in presence of dust. Recent progress in this area will be discussed.

The expansion of a plasma into a vacuum - Basic phenomena and processes and applications to space plasma physics

NASA Technical Reports Server (NTRS)

Wright, K. H., Jr.; Stone, N. H.; Samir, U.

1983-01-01

In this review attention is called to basic phenomena and physical processes involved in the expansion of a plasma into a vacuum, or the expansion of a plasma into a more tenuous plasma, in particular the fact that upon the expansion, ions are accelerated and reach energies well above their thermal energy. Also, in the process of the expansion a rarefaction wave propagates into the ambient plasma, an ion front moves into the expansion volume, and discontinuities in plasma parameters occur. The physical processes which cause the above phenomena are discussed, and their possible application is suggested for the case of the distribution of ions and electrons (hence plasma potential and electric fields) in the wake region behind artificial and natural obstacles moving supersonically in a rarefied space plasma. To illustrate this, some in situ results are reexamined. Directions for future work in this area via the utilization of the Space Shuttle and laboratory work are also mentioned.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo Xiaoming

The dominated process of controlled fusion is to let nuclei gain enough kinetic energy to overcome Coulomb barrier. As a result, a fusion scheme can consider two factors in its design: to increase kinetic energy of nuclei and to alter the Coulomb barrier. Cold Fusion and Hot fusion are all one-factor schemes while Intermediate Fusion is a twofactors scheme. This made CINF kinetically superior. Cold Fusion reduces deuteron-deuteron distance, addressing Coulomb barrier, and Hot Fusion heat up plasma into extreme high temperature, addressing kinetic energy. Without enough kinetic energy made Cold Fusion skeptical. Extreme high temperature made Hot Fusion verymore » difficult to engineer. Because CIFN addresses both factors, CIFN is a more promising technique to be industrialized.« less

Thermo-optically tunable thin film devices

NASA Astrophysics Data System (ADS)

Domash, Lawrence H.

2003-10-01

We report advances in tunable thin film technology and demonstration of multi-cavity tunable filters. Thin film interference coatings are the most widely used optical technology for telecom filtering, but until recently no tunable versions have been known except for mechanically rotated filters. We describe a new approach to broadly tunable components based on the properties of semiconductor thin films with large thermo-optic coefficients. The technology is based on amorphous silicon deposited by plasma-enhanced chemical vapor deposition (PECVD), a process adapted for telecom applications from its origins in the flat-panel display and solar cell industries. Unlike MEMS devices, tunable thin films can be constructed in sophisticated multi-cavity, multi-layer optical designs.

Kinetic advantage of controlled intermediate nuclear fusion

NASA Astrophysics Data System (ADS)

Guo, Xiaoming

2012-09-01

The dominated process of controlled fusion is to let nuclei gain enough kinetic energy to overcome Coulomb barrier. As a result, a fusion scheme can consider two factors in its design: to increase kinetic energy of nuclei and to alter the Coulomb barrier. Cold Fusion and Hot fusion are all one-factor schemes while Intermediate Fusion is a twofactors scheme. This made CINF kinetically superior. Cold Fusion reduces deuteron-deuteron distance, addressing Coulomb barrier, and Hot Fusion heat up plasma into extreme high temperature, addressing kinetic energy. Without enough kinetic energy made Cold Fusion skeptical. Extreme high temperature made Hot Fusion very difficult to engineer. Because CIFN addresses both factors, CIFN is a more promising technique to be industrialized.

Cost Models for MMC Manufacturing Processes

NASA Technical Reports Server (NTRS)

Elzey, Dana M.; Wadley, Haydn N. G.

1996-01-01

Processes for the manufacture of advanced metal matrix composites are rapidly approaching maturity in the research laboratory and there is growing interest in their transition to industrial production. However, research conducted to date has almost exclusively focused on overcoming the technical barriers to producing high-quality material and little attention has been given to the economical feasibility of these laboratory approaches and process cost issues. A quantitative cost modeling (QCM) approach was developed to address these issues. QCM are cost analysis tools based on predictive process models relating process conditions to the attributes of the final product. An important attribute, of the QCM approach is the ability to predict the sensitivity of material production costs to product quality and to quantitatively explore trade-offs between cost and quality. Applications of the cost models allow more efficient direction of future MMC process technology development and a more accurate assessment of MMC market potential. Cost models were developed for two state-of-the art metal matrix composite (MMC) manufacturing processes: tape casting and plasma spray deposition. Quality and Cost models are presented for both processes and the resulting predicted quality-cost curves are presented and discussed.

Study of ND3-enhanced MAR processes in D2-N2 plasmas to induce plasma detachment

NASA Astrophysics Data System (ADS)

Abe, Shota; Chakraborty Thakur, Saikat; Doerner, Russ; Tynan, George

2017-10-01

The Molecular Assisted Recombination (MAR) process is thought to be a main channel of volumetric recombination to induce the plasma detachment operation. Authors have focused on a new plasma recombination process supported by ammonia molecules, which will be formed by impurity seeding of N2 for controlling divertor plasma temperature and heat loads in ITER. This ammonia-enhanced MAR process would occur throughout two steps. In this study, the first step of the new MAR process is investigated in low density plasmas (Ne 1016 m-3, Te 4 eV) fueled by D2 and N2. Ion and neutral densities are measured by a calibrated Electrostatic Quadrupole Plasma (EQP) analyzer, combination of an ion energy analyzer and mass spectrometer. The EQP shows formation of ND3 during discharges. Ion densities calculated by a rate equation model are compared with experimental results. We find that the model can reproduce the observed ion densities in the plasma. The model calculation shows that the dominant neutralization channel of Dx+(x =1-3) ions in the volume is the formation of NDy+(y =3 or 4) throughout charge/D+ exchange reactions with ND3. Furthermore, high density plasmas (Ne 1016 m-3) have been achieved to investigate electron-impact dissociative recombination processes of formed NDy+,which is the second step of this MAR process.

The Basic Plasma Science Facility: a platform for studying plasma processes relevant to space and astrophysical settings

NASA Astrophysics Data System (ADS)

Carter, T. A.

2017-10-01

The Basic Plasma Science Facility at UCLA is a national user facility for studies of fundamental processes in magnetized plasmas. The centerpiece is the Large Plasma Device, a 20 m, magnetized linear plasma device. Two hot cathode plasma sources are available. A Barium Oxide coated cathode produces plasmas with n 1012 cm-3, Te 5 eV, Ti < 1 eV with magnetic field from 400G-2kG. This low- β plasma has been used to study fundamental processes, including: dispersion and damping of kinetic and inertial Alfvén waves, flux ropes and magnetic reconnection, three-wave interactions and parametric instabilities of Alfvén waves, turbulence and transport, and interactions of energetic ions and electrons with plasma waves. A new Lanthanum Hexaboride (LaB6) cathode is now available which produces significantly higher densities and temperatures: n < 5 ×1013 cm-3, Te 12 eV, Ti 6 eV. This higher pressure plasma source enabled the observation of laser-driven collisionless magnetized shocks and, with lowered magnetic field, provides magnetized plasmas with β approaching or possibly exceeding unity. This opens up opportunities for investigating processes relevant to the solar wind and astrophysical plasmas. BaPSF is jointly supported by US DOE and NSF.

Inductive plasmas for plasma processing

NASA Astrophysics Data System (ADS)

Keller, John H.

1996-05-01

With the need for high plasma density and low pressure in single wafer etching tools, a number of inductive etching systems have been and are being developed for commercial sale. This paper reviews some of the history of low-pressure inductive plasmas, gives features of inductive plasmas, limitations, corrections and presents uses for plasma processing. The theory for the skin depth, rf coil impedance and efficiency is also discussed.

Characterization of plasma processing induced charging damage to MOS devices

NASA Astrophysics Data System (ADS)

Ma, Shawming

1997-12-01

Plasma processing has become an integral part of the fabrication of integrated circuits and takes at least 30% of whole process steps since it offers advantages in terms of directionality, low temperature and process convenience. However, wafer charging during plasma processes is a significant concern for both thin oxide damage and profile distortion. In this work, the factors affecting this damage will be explained by plasma issues, device structure and oxide quality. The SPORT (Stanford Plasma On-wafer Real Time) charging probe was developed to investigate the charging mechanism of different plasma processes including poly-Si etching, resist ashing and PECVD. The basic idea of this probe is that it simulates a real device structure in the plasma environment and allows measurement of plasma induced charging voltages and currents directly in real time. This measurement is fully compatible with other charging voltage measurement but it is the only one to do in real-time. Effect of magnetic field induced plasma nonuniformity on spatial dependent charging is well understood by this measurement. In addition, the plasma parameters including ion current density and electron temperature can also be extracted from the probe's plasma I-V characteristics using a dc Langmuir probe like theory. It will be shown that the MOS device tunneling current from charging, the dependence on antenna ratio and the etch uniformity can all be predicted by using this measurement. Moreover, the real-time measurement reveals transient and electrode edge effect during processing. Furthermore, high aspect ratio pattern induced electron shading effects can also be characterized by the probe. On the oxide quality issue, wafer temperature during plasma processing has been experimentally shown to be critical to charging damage. Finally, different MOS capacitor testing methods including breakdown voltage, charge-to-breakdown, gate leakage current and voltage-time at constant current bias were compared to find the optimum method for charging device reliability testing.

Sensitivity of RF-driven Plasma Filaments to Trace Gases

NASA Astrophysics Data System (ADS)

Burin, M. J.; Czarnocki, C. J.; Czarnocki, K.; Zweben, S. J.; Zwicker, A.

2011-10-01

Filamentary structures have been observed in many types of plasma discharges in both natural (e.g. lightning) and industrial systems (e.g. dielectric barrier discharges). Recent progress has been made in characterizing these structures, though various aspects of their essential physics remain unclear. A common example of this phenomenon can be found within a toy plasma globe (or plasma ball), wherein a primarily neon gas mixture near atmospheric pressure clearly and aesthetically displays filamentation. Recent work has provided the first characterization of these plasma globe filaments [Campanell et al., Physics of Plasmas 2010], where it was noticed that discharges of pure gases tend not to produce filaments. We have extended this initial work to investigate in greater detail the dependence of trace gases on filamentation within a primarily Neon discharge. Our preliminary results using a custom globe apparatus will be presented, along with some discussion of voltage dependencies. Newly supported by the NSF/DOE Partnership in Basic Plasma Science and Engineering.

Increased expression of the yeast multidrug resistance ABC transporter Pdr18 leads to increased ethanol tolerance and ethanol production in high gravity alcoholic fermentation

PubMed Central

2012-01-01

Background The understanding of the molecular basis of yeast tolerance to ethanol may guide the design of rational strategies to increase process performance in industrial alcoholic fermentations. A set of 21 genes encoding multidrug transporters from the ATP-Binding Cassette (ABC) Superfamily and Major Facilitator Superfamily (MFS) in S. cerevisiae were scrutinized for a role in ethanol stress resistance. Results A yeast multidrug resistance ABC transporter encoded by the PDR18 gene, proposed to play a role in the incorporation of ergosterol in the yeast plasma membrane, was found to confer resistance to growth inhibitory concentrations of ethanol. PDR18 expression was seen to contribute to decreased 3 H-ethanol intracellular concentrations and decreased plasma membrane permeabilization of yeast cells challenged with inhibitory ethanol concentrations. Given the increased tolerance to ethanol of cells expressing PDR18, the final concentration of ethanol produced during high gravity alcoholic fermentation by yeast cells devoid of PDR18 was lower than the final ethanol concentration produced by the corresponding parental strain. Moreover, an engineered yeast strain in which the PDR18 promoter was replaced in the genome by the stronger PDR5 promoter, leading to increased PDR18 mRNA levels during alcoholic fermentation, was able to attain a 6 % higher ethanol concentration and a 17 % higher ethanol production yield than the parental strain. The improved fermentative performance of yeast cells over-expressing PDR18 was found to correlate with their increased ethanol tolerance and ability to restrain plasma membrane permeabilization induced throughout high gravity fermentation. Conclusions PDR18 gene over-expression increases yeast ethanol tolerance and fermentation performance leading to the production of highly inhibitory concentrations of ethanol. PDR18 overexpression in industrial yeast strains appears to be a promising approach to improve alcoholic fermentation performance for sustainable bio-ethanol production. PMID:22839110

Biomass waste-to-energy valorisation technologies: a review case for banana processing in Uganda.

PubMed

Gumisiriza, Robert; Hawumba, Joseph Funa; Okure, Mackay; Hensel, Oliver

2017-01-01

Uganda's banana industry is heavily impeded by the lack of cheap, reliable and sustainable energy mainly needed for processing of banana fruit into pulp and subsequent drying into chips before milling into banana flour that has several uses in the bakery industry, among others. Uganda has one of the lowest electricity access levels, estimated at only 2-3% in rural areas where most of the banana growing is located. In addition, most banana farmers have limited financial capacity to access modern solar energy technologies that can generate sufficient energy for industrial processing. Besides energy scarcity and unreliability, banana production, marketing and industrial processing generate large quantities of organic wastes that are disposed of majorly by unregulated dumping in places such as swamps, thereby forming huge putrefying biomass that emit green house gases (methane and carbon dioxide). On the other hand, the energy content of banana waste, if harnessed through appropriate waste-to-energy technologies, would not only solve the energy requirement for processing of banana pulp, but would also offer an additional benefit of avoiding fossil fuels through the use of renewable energy. The potential waste-to-energy technologies that can be used in valorisation of banana waste can be grouped into three: Thermal (Direct combustion and Incineration), Thermo-chemical (Torrefaction, Plasma treatment, Gasification and Pyrolysis) and Biochemical (Composting, Ethanol fermentation and Anaerobic Digestion). However, due to high moisture content of banana waste, direct application of either thermal or thermo-chemical waste-to-energy technologies is challenging. Although, supercritical water gasification does not require drying of feedstock beforehand and can be a promising thermo-chemical technology for gasification of wet biomass such as banana waste, it is an expensive technology that may not be adopted by banana farmers in Uganda. Biochemical conversion technologies are reported to be more eco-friendly and appropriate for waste biomass with high moisture content such as banana waste. Uganda's banana industrialisation is rural based with limited technical knowledge and economic capability to setup modern solar technologies and thermo-conversions for drying banana fruit pulp. This review explored the advantages of various waste-to-energy technologies as well as their shortfalls. Anaerobic digestion stands out as the most feasible and appropriate waste-to-energy technology for solving the energy scarcity and waste burden in banana industry. Finally, potential options for the enhancement of anaerobic digestion of banana waste were also elucidated.

Plasma Processing of Model Residential Solid Waste

NASA Astrophysics Data System (ADS)

Messerle, V. E.; Mossé, A. L.; Nikonchuk, A. N.; Ustimenko, A. B.; Baimuldin, R. V.

2017-09-01

The authors have tested the technology of processing of model residential solid waste. They have developed and created a pilot plasma unit based on a plasma chamber incinerator. The waste processing technology has been tested and prepared for commercialization.

Optical diagnostics and computational modeling of reacting and non-reacting single and multiphase flows

NASA Astrophysics Data System (ADS)

Basu, Saptarshi

Three critical problem domains namely water transport in PEM fuel cell, interaction of vortices with diffusion flames and laminar diffusion layers and thermo-physical processes in droplets heated by a plasma or monochromatic radiation have been analyzed in this dissertation. The first part of the dissertation exhibits a unique, in situ, line-of-sight measurements of water vapor partial pressure and temperature in single and multiple gas channels on the cathode side of an operating PEM fuel cell. Tunable diode laser absorption spectroscopy was employed for these measurements for which water transitions sensitive to temperature and partial pressure were utilized. The technique was demonstrated in a PEM fuel cell operating under both steady state and time-varying load conditions. The second part of the dissertation is dedicated to the study of vortex interaction with laminar diffusion flame and non-reacting diffusion layers. For the non-reacting case, a detailed computational study of scalar mixing in a laminar vortex is presented for vortices generated between two gas streams. A detailed parametric study was conducted to determine the effects of vortex strength, convection time, and non-uniform temperature on scalar mixing characteristics. For the reacting case, an experimental study of the interaction of a planar diffusion flame with a line vortex is presented. The flame-vortex interactions are diagnosed by laser induced incandescence for soot yield and by particle image velocimetry for vortex flow characterization. The soot topography was studied as a function of the vortex strength, residence time, flame curvature and the reactant streams from which vortices are initiated. The third part of the dissertation is modeling of thermo-physical processes in liquid ceramic precursor droplets injected into plasma as used in the thermal spray industry to generate thermal barrier coatings on high value materials. Models include aerodynamic droplet break-up process, mixing of droplets in the high temperature plasma, heat and mass transfer within individual droplets as well as droplet precipitation and internal pressurization. The last part of the work is also concerned with the modeling of thermo-physical processes in liquid ceramic precursor droplets heated by monochromatic radiation. Purpose of this work was to evaluate the feasibility of studying precipitation kinetics and morphological changes in a droplet by mimicking similar heating rates as the plasma.

Quantum Cascade Laser Absorption Spectroscopy as a Plasma Diagnostic Tool: An Overview

PubMed Central

Welzel, Stefan; Hempel, Frank; Hübner, Marko; Lang, Norbert; Davies, Paul B.; Röpcke, Jürgen

2010-01-01

The recent availability of thermoelectrically cooled pulsed and continuous wave quantum and inter-band cascade lasers in the mid-infrared spectral region has led to significant improvements and new developments in chemical sensing techniques using in-situ laser absorption spectroscopy for plasma diagnostic purposes. The aim of this article is therefore two-fold: (i) to summarize the challenges which arise in the application of quantum cascade lasers in such environments, and, (ii) to provide an overview of recent spectroscopic results (encompassing cavity enhanced methods) obtained in different kinds of plasma used in both research and industry. PMID:22163581

Quantum cascade laser absorption spectroscopy as a plasma diagnostic tool: an overview.

PubMed

Welzel, Stefan; Hempel, Frank; Hübner, Marko; Lang, Norbert; Davies, Paul B; Röpcke, Jürgen

2010-01-01

The recent availability of thermoelectrically cooled pulsed and continuous wave quantum and inter-band cascade lasers in the mid-infrared spectral region has led to significant improvements and new developments in chemical sensing techniques using in-situ laser absorption spectroscopy for plasma diagnostic purposes. The aim of this article is therefore two-fold: (i) to summarize the challenges which arise in the application of quantum cascade lasers in such environments, and, (ii) to provide an overview of recent spectroscopic results (encompassing cavity enhanced methods) obtained in different kinds of plasma used in both research and industry.

Plasma treatment effect on angiogenesis in wound healing process evaluated in vivo using angiographic optical coherence tomography

NASA Astrophysics Data System (ADS)

Kim, D. W.; Park, T. J.; Jang, S. J.; You, S. J.; Oh, W. Y.

2016-12-01

Non-thermal atmospheric pressure plasma holds promise for promoting wound healing. However, plasma-induced angiogenesis, which is important to better understand the underlying physics of plasma treatment effect on wound healing, remains largely unknown. We therefore evaluated the effect of non-thermal plasma on angiogenesis during wound healing through longitudinal monitoring over 30 days using non-invasive angiographic optical coherence tomography imaging in vivo. We demonstrate that the plasma-treated vascular wound area of mouse ear was noticeably decreased as compared to that of control during the early days in the wound healing process. We also observed that the vascular area density was increased in the plasma affected region near the wound as compared to the plasma unaffected region. The difference in the vascular wound area and the vascular area density peaked around day 3. This indicates that the plasma treatment induced additional angiogenic effects in the wound healing process especially during the early days. This non-invasive optical angiographic approach for in vivo time-lapse imaging provides further insights into elucidating plasma-induced angiogenesis in the wound healing process and its application in the biomedical plasma evaluation.

Preparation Of Sources For Plasma Vapor Deposition

NASA Technical Reports Server (NTRS)

Waters, William J.; Sliney, Hal; Kowalski, D.

1993-01-01

Multicomponent metal targets serving as sources of vapor for plasma vapor deposition made in modified pressureless-sintering process. By use of targets made in modified process, one coats components with materials previously plasma-sprayed or sintered but not plasma-vapor-deposited.

A review on plasma-etch-process induced damage of HgCdTe

NASA Astrophysics Data System (ADS)

Liu, Lingfeng; Chen, Yiyu; Ye, Zhenhua; Ding, Ruijun

2018-05-01

Dry etching techniques with minimal etch induced damage are required to develop highly anisotropic etch for pixel delineation of HgCdTe infrared focal plane arrays (IRFPAs). High density plasma process has become the main etching technique for HgCdTe in the past twenty years, In this paper, high density plasma electron cyclotron resonance (ECR) and inductively coupled plasma (ICP) etching of HgCdTe are summarized. Common plasma-etch-process induced type conversion and related mechanisms are reviewed particularly.

Changing the surface properties on naval steel as result of non-thermal plasma treatment

NASA Astrophysics Data System (ADS)

Hnatiuc, B.; Sabău, A.; Dumitrache, C. L.; Hnatiuc, M.; Crețu, M.; Astanei, D.

2016-08-01

The problem of corrosion, related to Biofouling formation, is an issue with very high importance in the maritime domain. According to new rules, the paints and all the technologies for the conditioning of naval materials must fulfil more restrictive environmental conditions. In order to solve this issue, different new clean technologies have been proposed. Among them, the use of non-thermal plasmas produced at atmospheric pressure plays a very important role. This study concerns the opportunity of plasma treatment for preparation or conditioning of naval steel OL36 type. The plasma reactors chosen for the experiments can operate at atmospheric pressure and are easy to use in industrial conditions. They are based on electrical discharges GlidArc and Spark, which already proved their efficiency for the surface activation or even for coatings of the surface. The non-thermal character of the plasma is ensured by a gas flow blown through the electrical discharges. One power supply has been used for reactors that provide a 5 kV voltage and a maximum current of 100 mA. The modifications of the surface properties and composition have been studied by XPS technique (X-ray Photoelectron Spectroscopy). There were taken into consideration 5 samples: 4 of them undergoing a Mini-torch plasma, a Gliding Spark, a GlidArc with dry air and a GlidArc with CO2, respectively the fifth sample which is the untreated witness. Before the plasma treatment, samples of naval steel were processed in order to obtain mechanical gloss. The time of treatment was chosen to 12 minutes. In the spectroscopic analysis, done on a ULVAC-PHI, Inc. PHI 5000 Versa Probe scanning XPS microprobe, a monocromated Al Kα X-ray source with a spot size of 100 μm2 was used to scan each sample while the photoelectrons were collected at a 45-degree take-off angle. Differences were found between atomic concentrations in each individual case, which proves that the active species produced by each type of plasma affects the surface properties of the treated naval steel.

Towards Plasma-Based Water Purification: Challenges and Prospects for the Future

NASA Astrophysics Data System (ADS)

Foster, John

2016-10-01

Freshwater scarcity derived from climate change, pollution, and over-development has led to serious consideration for water reuse. Advanced water treatment technologies will be required to process wastewater slated for reuse. One new and emerging technology that could potentially address the removal micropollutants in both drinking water as well as wastewater slated for reuse is plasma-based water purification. Plasma in contact with liquid water generates reactive species that attack and ultimately mineralize organic contaminants in solution. This interaction takes place in a boundary layer centered at the plasma-liquid interface. An understanding of the physical processes taking place at this interface, though poorly understood, is key to the optimization of plasma water purifiers. High electric field conditions, large density gradients, plasma-driven chemistries, and fluid dynamic effects prevail in this multiphase region. The region is also the source function for longer-lived reactive species that ultimately treat the water. Here, we review the need for advanced water treatment methods and in the process, make the case for plasma-based methods. Additionally, we survey the basic methods of interacting plasma with liquid water (including a discussion of breakdown processes in water), the current state of understanding of the physical processes taking place at the plasma-liquid interface, and the role that these processes play in water purification. The development of diagnostics usable in this multiphase environment along modeling efforts aimed at elucidating physical processes taking place at the interface are also detailed. Key experiments that demonstrate the capability of plasma-based water treatment are also reviewed. The technical challenges to the implementation of plasma-based water reactors are also discussed. NSF CBET 1336375 and DOE DE-SC0001939.

Review of microscopic plasma processes of occurring during refilling of the plasmasphere

NASA Technical Reports Server (NTRS)

Singh, N.; Torr, D. G.

1988-01-01

Refilling of the plasmashere after geomagnetic storms involves both macroscopic and microscopic plasma processes. The latter types of processes facilitate the refilling by trapping the plasma in the flux tube and by thermalizing the interhemispheric flow. A review of studies on microscopic processes is presented. The primary focus in this review is on the processes when the density is low and the plasma is collisionless. The discussion includes electrostatic shock formation, pitch angle scatterring extended ion heating and localized ion heating in the equatorial region.

Method to Improve Indium Bump Bonding via Indium Oxide Removal Using a Multi-Step Plasma Process

NASA Technical Reports Server (NTRS)

Dickie, Matthew R. (Inventor); Nikzad, Shouleh (Inventor); Greer, H. Frank (Inventor); Jones, Todd J. (Inventor); Vasquez, Richard P. (Inventor); Hoenk, Michael E. (Inventor)

2012-01-01

A process for removing indium oxide from indium bumps in a flip-chip structure to reduce contact resistance, by a multi-step plasma treatment. A first plasma treatment of the indium bumps with an argon, methane and hydrogen plasma reduces indium oxide, and a second plasma treatment with an argon and hydrogen plasma removes residual organics. The multi-step plasma process for removing indium oxide from the indium bumps is more effective in reducing the oxide, and yet does not require the use of halogens, does not change the bump morphology, does not attack the bond pad material or under-bump metallization layers, and creates no new mechanisms for open circuits.

Examinations on Laser Remote Welding of Ultra-thin Metal Foils Under Vacuum Conditions

NASA Astrophysics Data System (ADS)

Petrich, Martin; Stambke, Martin; Bergmann, Jean Pierre

Metal foils are commonly used for catalytic converters, vacuum insulations, in medical and electrical industry as well as for sensor applications and packaging. The investigations in this paper determine the influence of reduced atmospheric pressure during the welding process with a highly brilliant 400 W single-mode fiber laser combined with a 2D-scanning system. The laser beam is transmitted through a highly transparent glass into a vacuum chamber, where AISI 304 stainless steel foils with a thickness of 25 μm, 50 μm and 100 μm are positioned. The effects of reduced atmospheric pressure on the plasma formation are investigated by means of high-speed videography. Furthermore, the geometry of the weld seam is compared to atmospheric conditions as well as means of the process stability and the process efficiency. The welds were also evaluated by means of metallography. The research is a contribution for extending the range of micro welding applications and shows new aspects for future developments.

FOREWORD: International Topical Workshop on Plasma Physics: Coherent Processes in Nonlinear Media. Sponsored by the ICTP (Trieste) and the European Union (Brussels)

NASA Astrophysics Data System (ADS)

Shukla, P. K.; Bingham, R.; Stenflo, L.; Dawson, J. M.

1996-01-01

Starting in 1989 we have created a forum at the International Centre for Theoretical Physics, Trieste, where scientists from different parts of the world can meet and exchange information in the frontier areas of physics. In the three previous meetings, we focused on large amplitude waves and fields in plasmas, the physics of dusty plasmas, and wave-particle interactions and energization in plasmas. In 1995, we came up with a fresh idea of organizing somewhat enlarged but still well focused research topics that are cross-disciplinary. Thus, the usual 'fourth-week activity' of the Plasma Physics College at the ICTP was replaced by an International Topical Workshop on Plasma Physics: Coherent Processes in Nonlinear Media, which was held at the ICTP during the period 16-20 October, 1995. This provided us an opportunity to draw eminent speakers from many closely related fields such as plasma physics, fluid dynamics, nonlinear optics, and astrophysics. The Workshop was attended by 82 delegates from 34 countries, and the participation from the industrial and the developing countries was about half each. The programme included 4 review and 29 topical invited lectures. In addition, about 30 contributed papers were presented as posters in two sessions. The latter were created in order to give opportunities to younger physicists for displaying the results of their recent work and to obtain constructive comments from the other participants. During the five days at the ICTP, we focused on almost all the various aspects of nonlinear phenomena that are common in different branches of science. The review and topical lectures as well as the posters dealt with the most recent advances in coherent nonlinear processes in space and astrophysical plasmas, in fluids and optics, in low temperature dusty plasmas, as well as in laser produced and magnetically confined laboratory plasmas. The focus was on the physics of various types of waves and their generation mechanisms, the development of turbulence and the formation of coherent structures, particle and heat transport, plasma based charged particle acceleration by intense electrostatic waves that are created by powerful short laser beams, etc. Specifically, the review talks presented the general picture of the subject matter at hand and the underlying physics, whereas the remaining topical talks and the posters described the present state-of-the-art in the field. Instead of presenting the technical details, the speakers kept a good balance in injecting both the physics and the mathematical techniques to their audience. It was noted that despite the diversity of the physical problems, the mathematical equations governing particular phenomena and their solutions remain somewhat similar. Most contributions from the Trieste meeting appear in the form of a collection of articles in this Topical Issue of Physica Scripta, which will be distributed to all the delegates. We are grateful to the ICTP director Professor M A Virasoro and the deputy director Professor L Bertocchi for their generous support and warm hospitality at the ICTP. Thanks are also due to Professor G Denardo of the ICTP and Professor M H A Hassan of the Third World Academy of Sciences (TWAS, ICTP) for their constant and wholehearted support in our endeavours. We would like to express our gratitude to the ICTP and the Commission of the European Union (through the HCM networks on Dusty Plasmas and Nonlinear Phenomena in the Microphysics of Collisionless Plasmas) for providing partial financial support to our activities at Trieste. Finally, our cordial thanks are extended to the speakers and the attendees for their contributions which resulted in the success of this workshop. Specifically, we appreciate the speakers for delivering excellent talks, supplying well prepared manuscripts for publication, and enhancing the plasma physics activity at the ICTP. The excellent work of MS Ave Lusenti is gratefully acknowledged.

Two-Step Plasma Process for Cleaning Indium Bonding Bumps

NASA Technical Reports Server (NTRS)

Greer, Harold F.; Vasquez, Richard P.; Jones, Todd J.; Hoenk, Michael E.; Dickie, Matthew R.; Nikzad, Shouleh

2009-01-01

A two-step plasma process has been developed as a means of removing surface oxide layers from indium bumps used in flip-chip hybridization (bump bonding) of integrated circuits. The two-step plasma process makes it possible to remove surface indium oxide, without incurring the adverse effects of the acid etching process.

Bioactivity of plasma implanted biomaterials

NASA Astrophysics Data System (ADS)

Chu, Paul K.

2006-01-01

Plasma immersion ion implantation and deposition (PIII&D) is an effective technique to enhance the surface bioactivity of materials. In this paper, recent progress made in our laboratory on plasma surface modification of biomedical materials is described. NiTi alloys have unique super-elastic and shape memory properties and are suitable for orthopedic implants but the leaching of toxic Ni may pose health hazards in humans. We have recently investigated the use of acetylene, oxygen and nitrogen PIII&D to prevent out-diffusion of nickel and good results have been obtained. Silicon is the most important material in the microelectronics industry but its surface biocompatibility has not been investigated in details. We have recently performed hydrogen PIII into silicon to improve the surface bioactivity and observed biomimetic growth of apatite on the surface in simulated body fluids. Diamond-like carbon (DLC) is widely used in the industry due to its excellent mechanical properties and chemical inertness and by incorporation of elements such as nitrogen and phosphorus, the surface blood compatibility can be improved. The properties as well as in vitro biological test results are discussed in this article.

LARGE—A Plasma Torch for Surface Chemistry Applications and CVD Processes—A Status Report

NASA Astrophysics Data System (ADS)

Zimmermann, Stephan; Theophile, Eckart; Landes, Klaus; Schein, Jochen

2008-12-01

The LARGE ( LONG ARG GENERATOR) is a new generation DC-plasma torch featuring an extended arc which is operated with a perpendicular gas flow to create a wide (up to 45 cm) plasma jet well suited for large area plasma processing. Using plasma diagnostic systems like high speed imaging, enthalpy probe, emission spectroscopy, and tomography, the LARGE produced plasma jet characteristics have been measured and sources of instability have been identified. With a simple model/simulation of the system LARGE III-150 and numerous experimental results, a new nozzle configuration and geometry (LARGE IV-150) has been designed, which produces a more homogenous plasma jet. These improvements enable the standard applications of the LARGE plasma torch (CVD coating process and surface activation process) to operate with higher efficiency.

Generation of nano roughness on fibrous materials by atmospheric plasma

NASA Astrophysics Data System (ADS)

Kulyk, I.; Scapinello, M.; Stefan, M.

2012-12-01

Atmospheric plasma technology finds novel applications in textile industry. It eliminates the usage of water and of hazard liquid chemicals, making production much more eco-friendly and economically convenient. Due to chemical effects of atmospheric plasma, it permits to optimize dyeing and laminating affinity of fabrics, as well as anti-microbial treatments. Other important applications such as increase of mechanical resistance of fiber sleeves and of yarns, anti-pilling properties of fabrics and anti-shrinking property of wool fabrics were studied in this work. These results could be attributed to the generation of nano roughness on fibers surface by atmospheric plasma. Nano roughness generation is extensively studied at different conditions. Alternative explanations for the important practical results on textile materials and discussed.

Fabrication of photocatalytically active vanadium oxide nanostructures via plasma route

NASA Astrophysics Data System (ADS)

Kajita, Shin; Yoshida, Tomoko; Ohno, Noriyasu; Ichino, Yusuke; Yoshida, Naoaki

2018-05-01

Plasma irradiation was used to create nanostructured vanadium oxide with potential commercial and industrial applications. Morphology changes were induced at the nano- and micro-meter scale, accompanied by the growth of helium nanobubbles. Micrometer-sized pillars, cube-shaped nanostructures, and fuzzy fiberform nanostructures were grown on the surface; the necessary conditions in terms of the incident ion energy and the surface temperature for those morphology changes were revealed. Hydrogen production experiments using a photocatalytic reaction with aqueous methanol solution were conducted on the fabricated samples. Enhanced H2 production was confirmed with the plasma irradiated nanostructured sample that had been oxidized in air atmosphere. Photocatalytically inactive vanadium oxide exhibited a high photocatalytic activity after nanostructurization of the surface by helium plasma irradiation.

The low-cost microwave plasma sources for science and industry applications

NASA Astrophysics Data System (ADS)

Tikhonov, V. N.; Aleshin, S. N.; Ivanov, I. A.; Tikhonov, A. V.

2017-11-01

Microwave plasma torches proposed in the world market are built according to a scheme that can be called classical: power supply - magnetron head - microwave isolator with water load - reflected power meter - matching device - actual plasma torch - sliding short circuit. The total cost of devices from this list with a microwave generator of 3 kW in the performance, for example, of SAIREM (France), is about 17,000 €. We have changed the classical scheme of the microwave plasmathrone and optimised design of the waveguide channel. As a result, we can supply simple and reliable sources of microwave plasma (complete with our low-budget microwave generator up to 3 kW and a simple plasmathrone of atmospheric pressure) at a price from 3,000 €.

Development Study of Cartridge/Crucible Tube Materials

NASA Technical Reports Server (NTRS)

McKechnie, Timothy N.; ODell, Scott J.

1998-01-01

The limitations of traditional alloys and the desire for improved performance for components is driving the increased utilization of refractory metals in tile space industry. From advanced propulsion systems to high temperature furnace components for microgravity processing, refractory metals are being used for their high melting temperatures and inherent chemical stability. Techniques have been developed to produce near net shape refractory metal components utilizing vacuum plasma spraying. Material utilization is very high, and laborious machining can be avoided. As-spray formed components have been tested and found to perform adequately. However, increased mechanical and thermal properties are needed. To improve these properties, post processing thermal treatments such as hydrogen sintering and vacuum annealing have been performed. Components formed from alloys of tungsten, rhenium, tantalum, niobium, and molybdenum are discussed and a metallurgical analyses detailing the results are presented. A qualitative comparison of mechanical properties is also included.

Strength and failure analysis of composite-to-composite adhesive bonds with different surface treatments

NASA Astrophysics Data System (ADS)

Paranjpe, Nikhil; Alamir, Mohammed; Alonayni, Abdullah; Asmatulu, Eylem; Rahman, Muhammad M.; Asmatulu, Ramazan

2018-03-01

Adhesives are widely utilized materials in aviation, automotive, energy, defense, and marine industries. Adhesive joints are gradually supplanting mechanical fasteners because they are lightweight structures, thus making the assembly lighter and easier. They also act as a sealant to prevent a structural joint from galvanic corrosion and leakages. Adhesive bonds provide high joint strength because of the fact that the load is distributed uniformly on the joint surface, while in mechanical joints, the load is concentrated at one point, thus leading to stress at that point and in turn causing joint failures. This research concentrated on the analysis of bond strength and failure loads in adhesive joint of composite-to-composite surfaces. Different durations of plasma along with the detergent cleaning were conducted on the composite surfaces prior to the adhesive applications and curing processes. The joint strength of the composites increased about 34% when the surface was plasma treated for 12 minutes. It is concluded that the combination of different surface preparations, rather than only one type of surface treatment, provides an ideal joint quality for the composites.

Hazardous and Medical Waste Destruction Using the AC Plasmatron Final Report CRADA No. TC-1560-98

DOE Office of Scientific and Technical Information (OSTI.GOV)

Caplan, M.; Bucher, K.; Tulupov, A.

The goal of this project was to develop a prototype medical waste destruction facility based on the AC plasma torch capable of processing 150 kg of waste per hour while satisfying US EPA emission standards. The project was to provide the first opportunity for a joint U.S.-Russian project using an AC Plasma Torch in a hazardous waste destruction system to be assembled and operated in the U.S. thus promoting the commercialization in the U.S. of this joint U.S.-Russian developed technology. This project was a collaboration between the Russian Institute Soliton- NTT, the U.S industrial partner Scientific Utilization Inc. (SUI) andmore » Lawrence Livermore National Laboratory ( LLNL). The project was funded by DOE for a total of $1.2 million with $600K for allocated for Phase I and $600K for Phase II. The Russian team received about $800K over the two (2) year period while LLNL received $400K. SUI was to provide in kind matching funds totaling $1.2 million.« less

D.C. - ARC plasma generator for nonequilibrium plasmachemical processes

NASA Astrophysics Data System (ADS)

Kvaltin, J.

1990-06-01

The analysis of conditions for generation of nonequilibrium plasma to plasmachemical processes is made and the design of d.c.-arc plasma generator on the base of integral criterion is suggested. The measurement of potentials on the plasma column of that generator is presented.

Vapor Phase Deposition Using Plasma Spray-PVD™

NASA Astrophysics Data System (ADS)

von Niessen, K.; Gindrat, M.; Refke, A.

2010-01-01

Plasma spray—physical vapor deposition (PS-PVD) is a low pressure plasma spray technology to deposit coatings out of the vapor phase. PS-PVD is a part of the family of new hybrid processes recently developed by Sulzer Metco AG (Switzerland) on the basis of the well-established low pressure plasma spraying (LPPS) technology. Included in this new process family are plasma spray—chemical vapor deposition (PS-CVD) and plasma spray—thin film (PS-TF) processes. In comparison to conventional vacuum plasma spraying and LPPS, these new processes use a high energy plasma gun operated at a work pressure below 2 mbar. This leads to unconventional plasma jet characteristics which can be used to obtain specific and unique coatings. An important new feature of PS-PVD is the possibility to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats, but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional PVD technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and EB-PVD coatings. This paper reports on the progress made at Sulzer Metco to develop functional coatings build up from vapor phase of oxide ceramics and metals.