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Sample records for initially p-type silicon

  1. Application of neutron transmutation doping method to initially p-type silicon material.

    PubMed

    Kim, Myong-Seop; Kang, Ki-Doo; Park, Sang-Jun

    2009-01-01

    The neutron transmutation doping (NTD) method was applied to the initially p-type silicon in order to extend the NTD applications at HANARO. The relationship between the irradiation neutron fluence and the final resistivity of the initially p-type silicon material was investigated. The proportional constant between the neutron fluence and the resistivity was determined to be 2.3473x10(19)nOmegacm(-1). The deviation of the final resistivity from the target for almost all the irradiation results of the initially p-type silicon ingots was at a range from -5% to 2%. In addition, the burn-up effect of the boron impurities, the residual (32)P activity and the effect of the compensation characteristics for the initially p-type silicon were studied. Conclusively, the practical methodology to perform the neutron transmutation doping of the initially p-type silicon ingot was established.

  2. P-type silicon drift detectors

    SciTech Connect

    Walton, J.T.; Krieger, B.; Krofcheck, D.; O`Donnell, R.; Odyniec, G.; Partlan, M.D.; Wang, N.W.

    1995-06-01

    Preliminary results on 16 CM{sup 2}, position-sensitive silicon drift detectors, fabricated for the first time on p-type silicon substrates, are presented. The detectors were designed, fabricated, and tested recently at LBL and show interesting properties which make them attractive for use in future physics experiments. A pulse count rate of approximately 8 {times} l0{sup 6} s{sup {minus}1} is demonstrated by the p-type silicon drift detectors. This count rate estimate is derived by measuring simultaneous tracks produced by a laser and photolithographic mask collimator that generates double tracks separated by 50 {mu}m to 1200 {mu}m. A new method of using ion-implanted polysilicon to produce precise valued bias resistors on the silicon drift detectors is also discussed.

  3. Irradiation and annealing of p-type silicon carbide

    SciTech Connect

    Lebedev, Alexander A.; Bogdanova, Elena V.; Grigor'eva, Maria V.; Lebedev, Sergey P.; Kozlovski, Vitaly V.

    2014-02-21

    The development of the technology of semiconductor devices based on silicon carbide and the beginning of their industrial manufacture have made increasingly topical studies of the radiation hardness of this material on the one hand and of the proton irradiation to form high-receptivity regions on the other hand. This paper reports on a study of the carrier removal rate (V{sub d}) in p-6H-SiC under irradiation with 8 MeV protons and of the conductivity restoration in radiation- compensated epitaxial layers of various p-type silicon carbide polytypes. V{sub d} was determined by analysis of capacitance-voltage characteristics and from results of Hall effect measurements. It was found that the complete compensation of samples with the initial value of Na - Nd ≈ 1.5 × 10{sup 18} cm{sup −3} occurs at an irradiation dose of ∼1.1 × 10{sup 16} cm{sup −2}. It is shown that specific features of the sublimation layer SiC (compared to CVD layers) are clearly manifested upon the gamma and electron irradiation and are hardly noticeable under the proton and neutron irradiation. It was also found that the radiation-induced compensation of SiC is retained after its annealing at ≤1000°C. The conductivity is almost completely restored at T ≥ 1200°C. This character of annealing of the radiation compensation is independent of a silicon carbide polytype and the starting doping level of the epitaxial layer. The complete annealing temperatures considerably exceed the working temperatures of SiC-based devices. It is shown that the radiation compensation is a promising method in the technology of high-temperature devices based on SiC.

  4. New electron trap in p-type Czochralski silicon

    NASA Technical Reports Server (NTRS)

    Mao, B.-Y.; Lagowski, J.; Gatos, H. C.

    1984-01-01

    A new electron trap (acceptor level) was discovered in p-type Czochralski (CZ) silicon by current transient spectroscopy. The behavior of this trap was found to be similar to that of the oxygen thermal donors; thus, 450 C annealing increases the trap concentration while high-temperature annealing (1100-1200 C) leads to the virtual elimination of the trap. The new trap is not observed in either float-zone or n-type CZ silicon. Its energy level depends on the group III doping element in the sample. These findings suggest that the trap is related to oxygen, and probably to the acceptor impurity as well.

  5. New electron trap in p-type Czochralski silicon

    NASA Technical Reports Server (NTRS)

    Mao, B.-Y.; Lagowski, J.; Gatos, H. C.

    1984-01-01

    A new electron trap (acceptor level) was discovered in p-type Czochralski (CZ) silicon by current transient spectroscopy. The behavior of this trap was found to be similar to that of the oxygen thermal donors; thus, 450 C annealing increases the trap concentration while high-temperature annealing (1100-1200 C) leads to the virtual elimination of the trap. The new trap is not observed in either float-zone or n-type CZ silicon. Its energy level depends on the group III doping element in the sample. These findings suggest that the trap is related to oxygen, and probably to the acceptor impurity as well.

  6. p-type silicon detector for brachytherapy dosimetry.

    PubMed

    Piermattei, A; Azario, L; Monaco, G; Soriani, A; Arcovito, G

    1995-06-01

    The sensitivity of a cylindrical p-type silicon detector was studied by means of air and water measurements using different photon beams. A lead filter cap around the diode was used to minimize the dependence of the detector response as a function of the brachytherapy photon energy. The radial dose distribution of a high-activity 192Ir source in a brachytherapy phantom was measured by means of the shielded diode and the agreement of these data with theoretical evaluations confirms the method used to compensate diode response in the intermediate energy range. The diode sensitivity was constant over a wide range of dose rates of clinical interest; this allowed one to have a small detector calibrated in terms of absorbed dose in a medium. Theoretical evaluations showed that a single shielding filter around the p-type diode is sufficient to obtain accurate dosimetry for 192Ir, 137Cs, and 60Co brachytherapy sources.

  7. P type porous silicon resistivity and carrier transport

    SciTech Connect

    Ménard, S.; Fèvre, A.; Billoué, J.; Gautier, G.

    2015-09-14

    The resistivity of p type porous silicon (PS) is reported on a wide range of PS physical properties. Al/PS/Si/Al structures were used and a rigorous experimental protocol was followed. The PS porosity (P{sub %}) was found to be the major contributor to the PS resistivity (ρ{sub PS}). ρ{sub PS} increases exponentially with P{sub %}. Values of ρ{sub PS} as high as 1 × 10{sup 9} Ω cm at room temperature were obtained once P{sub %} exceeds 60%. ρ{sub PS} was found to be thermally activated, in particular, when the temperature increases from 30 to 200 °C, a decrease of three decades is observed on ρ{sub PS}. Based on these results, it was also possible to deduce the carrier transport mechanisms in PS. For P{sub %} lower than 45%, the conduction occurs through band tails and deep levels in the tissue surrounding the crystallites. When P{sub %} overpasses 45%, electrons at energy levels close to the Fermi level allow a hopping conduction from crystallite to crystallite to appear. This study confirms the potential of PS as an insulating material for applications such as power electronic devices.

  8. Recombination sources in p-type high performance multicrystalline silicon

    NASA Astrophysics Data System (ADS)

    Cheong Sio, Hang; Pheng Phang, Sieu; Zheng, Peiting; Wang, Quanzhi; Chen, Wei; Jin, Hao; Macdonald, Daniel

    2017-08-01

    This paper presents a comprehensive assessment of the electronic properties of an industrially grown p-type high performance multicrystalline silicon ingot. Wafers from different positions of the ingot are analysed in terms of their material quality before and after phosphorus diffusion and hydrogenation, as well as their final cell performance. In addition to lifetime measurements, we apply a recently developed technique for imaging the recombination velocity of structural defects. Our results show that phosphorus gettering benefits the intra-grain regions but also activates the grain boundaries, resulting in a reduction in the average lifetimes. Hydrogenation can significantly improve the overall lifetimes, predominantly due to its ability to passivate grain boundaries. Dislocation clusters remain strongly recombination active after all processes. It is found that the final cell efficiency coincides with the varying material quality along the ingot. Wafers toward the ingot top are more influenced by carrier recombination at dislocation clusters, whereas wafers near the bottom are more affected by a combination of their lower intra-grain lifetimes and a greater density of recombination active grain boundaries.

  9. Investigations into the electrochemical etching process of p-type silicon using ethanol-surfactant solutions

    NASA Astrophysics Data System (ADS)

    Balakrishnan, Sivakumar; Gun'ko, Yurii K.; Swiegers, Gerhard F.; Perova, Tatiana S.

    2017-09-01

    In this work, the electrochemical etching of p-type silicon was performed in aqueous ethanol-surfactant solutions and the dependence of morphology and luminescent properties of porous silicon with respect to the etching parameters and silicon resistivities have been studied. The obtained porous silicon structures have been studied using various characterisation techniques such as SEM (Scanning Electron Microscopy) and Photoluminescence (PL) spectroscopy.

  10. Development of improved p-type silicon-germanium alloys

    NASA Technical Reports Server (NTRS)

    Mclane, George; Wood, Charles; Vandersande, Jan; Raag, Valvo; Heshmatpour, Ben

    1987-01-01

    Annealing experiments in the temperature range 1100-1275 C have been performed on p-type Si(0.8)Ge(0.2) samples with BP, B(6.5)P, and GaSb material additives. Both electrical resistivity and Seebeck coefficient generally decrease for these samples as annealing temperature is increased, with thermoelectric power factor sometimes being improved by annealing.

  11. Reassessment of the recombination parameters of chromium in n- and p-type crystalline silicon and chromium-boron pairs in p-type crystalline silicon

    SciTech Connect

    Sun, Chang Rougieux, Fiacre E.; Macdonald, Daniel

    2014-06-07

    Injection-dependent lifetime spectroscopy of both n- and p-type, Cr-doped silicon wafers with different doping levels is used to determine the defect parameters of Cr{sub i} and CrB pairs, by simultaneously fitting the measured lifetimes with the Shockley-Read-Hall model. A combined analysis of the two defects with the lifetime data measured on both n- and p-type samples enables a significant tightening of the uncertainty ranges of the parameters. The capture cross section ratios k = σ{sub n}/σ{sub p} of Cr{sub i} and CrB are determined as 3.2 (−0.6, +0) and 5.8 (−3.4, +0.6), respectively. Courtesy of a direct experimental comparison of the recombination activity of chromium in n- and p-type silicon, and as also suggested by modelling results, we conclude that chromium has a greater negative impact on carrier lifetimes in p-type silicon than n-type silicon with similar doping levels.

  12. Single p-type/intrinsic/n-type silicon nanowires as nanoscale avalanche photodetectors.

    PubMed

    Yang, Chen; Barrelet, Carl J; Capasso, Federico; Lieber, Charles M

    2006-12-01

    We report the controlled synthesis of axial modulation-doped p-type/intrinsic/n-type (p-i-n) silicon nanowires with uniform diameters and single-crystal structures. The p-i-n nanowires were grown in three sequential steps: in the presence of diborane for the p-type region, in the absence of chemical dopant sources for the middle segment, and in the presence of phosphine for the n-type region. The p-i-n nanowires were structurally characterized by transmission electron microscopy, and the spatially resolved electrical properties of individual nanowires were determined by electrostatic force and scanning gate microscopies. Temperature-dependent current-voltage measurements recorded from individual p-i-n devices show an increase in the breakdown voltage with temperature, characteristic of band-to-band impact ionization, or avalanche breakdown. Spatially resolved photocurrent measurements show that the largest photocurrent is generated at the intrinsic region located between the electrode contacts, with multiplication factors in excess of ca. 30, and demonstrate that single p-i-n nanowires function as avalanche photodiodes. Electron- and hole-initiated avalanche gain measurements performed by localized photoexcitation of the p-type and n-type regions yield multiplication factors of ca. 100 and 20, respectively. These results demonstrate the significant potential of single p-i-n nanowires as nanoscale avalanche photodetectors and open possible opportunities for studying impact ionization of electrons and holes within quasi-one-dimensional semiconductor systems.

  13. Method of mitigating titanium impurities effects in p-type silicon material for solar cells

    NASA Technical Reports Server (NTRS)

    Salama, A. M. (Inventor)

    1980-01-01

    Microstructural evaluation tests performed on Cu-doped, Ti-doped and Cu/Ti doped p-type silicon single crystal wafers, before and after the solar cell fabrication, and evaluation of both dark forward and reverse I-V characteristic records for the solar cells produced from the corresponding silicon wafers, show that Cu mitigates the unfavorable effects of Ti, and thus provides for higher conversion efficiency, thereby providing an economical way to reduce the deleterious effects of titanium, one of the impurities present in metallurgical grade silicon material.

  14. P-Type Silicon Strip Sensors for the new CMS Tracker at HL-LHC

    NASA Astrophysics Data System (ADS)

    Adam, W.; Bergauer, T.; Brondolin, E.; Dragicevic, M.; Friedl, M.; Frühwirth, R.; Hoch, M.; Hrubec, J.; König, A.; Steininger, H.; Waltenberger, W.; Alderweireldt, S.; Beaumont, W.; Janssen, X.; Lauwers, J.; Van Mechelen, P.; Van Remortel, N.; Van Spilbeeck, A.; Beghin, D.; Brun, H.; Clerbaux, B.; Delannoy, H.; De Lentdecker, G.; Fasanella, G.; Favart, L.; Goldouzian, R.; Grebenyuk, A.; Karapostoli, G.; Lenzi, Th.; Léonard, A.; Luetic, J.; Postiau, N.; Seva, T.; Vanlaer, P.; Vannerom, D.; Wang, Q.; Zhang, F.; Abu Zeid, S.; Blekman, F.; De Bruyn, I.; De Clercq, J.; D'Hondt, J.; Deroover, K.; Lowette, S.; Moortgat, S.; Moreels, L.; Python, Q.; Skovpen, K.; Van Mulders, P.; Van Parijs, I.; Bakhshiansohi, H.; Bondu, O.; Brochet, S.; Bruno, G.; Caudron, A.; Delaere, C.; Delcourt, M.; De Visscher, S.; Francois, B.; Giammanco, A.; Jafari, A.; Komm, M.; Krintiras, G.; Lemaitre, V.; Magitteri, A.; Mertens, A.; Michotte, D.; Musich, M.; Piotrzkowski, K.; Quertenmont, L.; Szilasi, N.; Vidal Marono, M.; Wertz, S.; Beliy, N.; Caebergs, T.; Daubie, E.; Hammad, G. H.; Härkönen, J.; Lampén, T.; Luukka, P.; Peltola, T.; Tuominen, E.; Tuovinen, E.; Eerola, P.; Tuuva, T.; Baulieu, G.; Boudoul, G.; Caponetto, L.; Combaret, C.; Contardo, D.; Dupasquier, T.; Gallbit, G.; Lumb, N.; Mirabito, L.; Perries, S.; Vander Donckt, M.; Viret, S.; Agram, J.-L.; Andrea, J.; Bloch, D.; Bonnin, C.; Brom, J.-M.; Chabert, E.; Chanon, N.; Charles, L.; Conte, E.; Fontaine, J.-Ch.; Gross, L.; Hosselet, J.; Jansova, M.; Tromson, D.; Autermann, C.; Feld, L.; Karpinski, W.; Kiesel, K. M.; Klein, K.; Lipinski, M.; Ostapchuk, A.; Pierschel, G.; Preuten, M.; Rauch, M.; Schael, S.; Schomakers, C.; Schulz, J.; Schwering, G.; Wlochal, M.; Zhukov, V.; Pistone, C.; Fluegge, G.; Kuensken, A.; Pooth, O.; Stahl, A.; Aldaya, M.; Asawatangtrakuldee, C.; Beernaert, K.; Bertsche, D.; Contreras-Campana, C.; Eckerlin, G.; Eckstein, D.; Eichhorn, T.; Gallo, E.; Garay Garcia, J.; Hansen, K.; Haranko, M.; Harb, A.; Hauk, J.; Keaveney, J.; Kalogeropoulos, A.; Kleinwort, C.; Lohmann, W.; Mankel, R.; Maser, H.; Mittag, G.; Muhl, C.; Mussgiller, A.; Pitzl, D.; Reichelt, O.; Savitskyi, M.; Schuetze, P.; Walsh, R.; Zuber, A.; Biskop, H.; Buhmann, P.; Centis-Vignali, M.; Garutti, E.; Haller, J.; Hoffmann, M.; Lapsien, T.; Matysek, M.; Perieanu, A.; Scharf, Ch.; Schleper, P.; Schmidt, A.; Schwandt, J.; Sonneveld, J.; Steinbrück, G.; Vormwald, B.; Wellhausen, J.; Abbas, M.; Amstutz, C.; Barvich, T.; Barth, Ch.; Boegelspacher, F.; De Boer, W.; Butz, E.; Caselle, M.; Colombo, F.; Dierlamm, A.; Freund, B.; Hartmann, F.; Heindl, S.; Husemann, U.; Kornmayer, A.; Kudella, S.; Muller, Th.; Simonis, H. J.; Steck, P.; Weber, M.; Weiler, Th.; Anagnostou, G.; Asenov, P.; Assiouras, P.; Daskalakis, G.; Kyriakis, A.; Loukas, D.; Paspalaki, L.; Siklér, F.; Veszprémi, V.; Bhardwaj, A.; Dalal, R.; Jain, G.; Ranjan, K.; Bakhshiansohl, H.; Behnamian, H.; Khakzad, M.; Naseri, M.; Cariola, P.; Creanza, D.; De Palma, M.; De Robertis, G.; Fiore, L.; Franco, M.; Loddo, F.; Silvestris, L.; Maggi, G.; Martiradonna, S.; My, S.; Selvaggi, G.; Albergo, S.; Cappello, G.; Chiorboli, M.; Costa, S.; Di Mattia, A.; Giordano, F.; Potenza, R.; Saizu, M. A.; Tricomi, A.; Tuve, C.; Barbagli, G.; Brianzi, M.; Ciaranfi, R.; Ciulli, V.; Civinini, C.; D'Alessandro, R.; Focardi, E.; Latino, G.; Lenzi, P.; Meschini, M.; Paoletti, S.; Russo, L.; Scarlini, E.; Sguazzoni, G.; Strom, D.; Viliani, L.; Ferro, F.; Lo Vetere, M.; Robutti, E.; Dinardo, M. E.; Fiorendi, S.; Gennai, S.; Malvezzi, S.; Manzoni, R. A.; Menasce, D.; Moroni, L.; Pedrini, D.; Azzi, P.; Bacchetta, N.; Bisello, D.; Dall'Osso, M.; Pozzobon, N.; Tosi, M.; De Canio, F.; Gaioni, L.; Manghisoni, M.; Nodari, B.; Riceputi, E.; Re, V.; Traversi, G.; Comotti, D.; Ratti, L.; Alunni Solestizi, L.; Biasini, M.; Bilei, G. M.; Cecchi, C.; Checcucci, B.; Ciangottini, D.; Fanò, L.; Gentsos, C.; Ionica, M.; Leonardi, R.; Manoni, E.; Mantovani, G.; Marconi, S.; Mariani, V.; Menichelli, M.; Modak, A.; Morozzi, A.; Moscatelli, F.; Passeri, D.; Placidi, P.; Postolache, V.; Rossi, A.; Saha, A.; Santocchia, A.; Storchi, L.; Spiga, D.; Androsov, K.; Azzurri, P.; Arezzini, S.; Bagliesi, G.; Basti, A.; Boccali, T.; Borrello, L.; Bosi, F.; Castaldi, R.; Ciampa, A.; Ciocci, M. A.; Dell'Orso, R.; Donato, S.; Fedi, G.; Giassi, A.; Grippo, M. T.; Ligabue, F.; Lomtadze, T.; Magazzu, G.; Martini, L.; Mazzoni, E.; Messineo, A.; Moggi, A.; Morsani, F.; Palla, F.; Palmonari, F.; Raffaelli, F.; Rizzi, A.; Savoy-Navarro, A.; Spagnolo, P.; Tenchini, R.; Tonelli, G.; Venturi, A.; Verdini, P. G.; Bellan, R.; Costa, M.; Covarelli, R.; Da Rocha Rolo, M.; Demaria, N.; Rivetti, A.; Dellacasa, G.; Mazza, G.; Migliore, E.; Monteil, E.; Pacher, L.; Ravera, F.; Solano, A.; Fernandez, M.; Gomez, G.; Jaramillo Echeverria, R.; Moya, D.; Gonzalez Sanchez, F. J.; Vila, I.; Virto, A. L.; Abbaneo, D.; Ahmed, I.; Albert, E.; Auzinger, G.; Berruti, G.; Bianchi, G.; Blanchot, G.; Bonnaud, J.; Caratelli, A.; Ceresa, D.; Christiansen, J.; Cichy, K.; Daguin, J.; D'Auria, A.; Detraz, S.; Deyrail, D.; Dondelewski, O.; Faccio, F.; Frank, N.; Gadek, T.; Gill, K.; Honma, A.; Hugo, G.; Jara Casas, L. M.; Kaplon, J.; Kornmayer, A.; Kottelat, L.; Kovacs, M.; Krammer, M.; Lenoir, P.; Mannelli, M.; Marchioro, A.; Marconi, S.; Mersi, S.; Martina, S.; Michelis, S.; Moll, M.; Onnela, A.; Orfanelli, S.; Pavis, S.; Peisert, A.; Pernot, J.-F.; Petagna, P.; Petrucciani, G.; Postema, H.; Rose, P.; Tropea, P.; Troska, J.; Tsirou, A.; Vasey, F.; Vichoudis, P.; Verlaat, B.; Zwalinski, L.; Bachmair, F.; Becker, R.; di Calafiori, D.; Casal, B.; Berger, P.; Djambazov, L.; Donega, M.; Grab, C.; Hits, D.; Hoss, J.; Kasieczka, G.; Lustermann, W.; Mangano, B.; Marionneau, M.; Martinez Ruiz del Arbol, P.; Masciovecchio, M.; Meinhard, M.; Perozzi, L.; Roeser, U.; Starodumov, A.; Tavolaro, V.; Wallny, R.; Zhu, D.; Amsler, C.; Bösiger, K.; Caminada, L.; Canelli, F.; Chiochia, V.; de Cosa, A.; Galloni, C.; Hreus, T.; Kilminster, B.; Lange, C.; Maier, R.; Ngadiuba, J.; Pinna, D.; Robmann, P.; Taroni, S.; Yang, Y.; Bertl, W.; Deiters, K.; Erdmann, W.; Horisberger, R.; Kaestli, H.-C.; Kotlinski, D.; Langenegger, U.; Meier, B.; Rohe, T.; Streuli, S.; Cussans, D.; Flacher, H.; Goldstein, J.; Grimes, M.; Jacob, J.; Seif El Nasr-Storey, S.; Cole, J.; Hoad, C.; Hobson, P.; Morton, A.; Reid, I. D.; Auzinger, G.; Bainbridge, R.; Dauncey, P.; Hall, G.; James, T.; Magnan, A.-M.; Pesaresi, M.; Raymond, D. M.; Uchida, K.; Garabedian, A.; Heintz, U.; Narain, M.; Nelson, J.; Sagir, S.; Speer, T.; Swanson, J.; Tersegno, D.; Watson-Daniels, J.; Chertok, M.; Conway, J.; Conway, R.; Flores, C.; Lander, R.; Pellett, D.; Ricci-Tam, F.; Squires, M.; Thomson, J.; Yohay, R.; Burt, K.; Ellison, J.; Hanson, G.; Olmedo, M.; Si, W.; Yates, B. R.; Gerosa, R.; Sharma, V.; Vartak, A.; Yagil, A.; Zevi Della Porta, G.; Dutta, V.; Gouskos, L.; Incandela, J.; Kyre, S.; Mullin, S.; Patterson, A.; Qu, H.; White, D.; Dominguez, A.; Bartek, R.; Cumalat, J. P.; Ford, W. T.; Jensen, F.; Johnson, A.; Krohn, M.; Leontsinis, S.; Mulholland, T.; Stenson, K.; Wagner, S. R.; Apresyan, A.; Bolla, G.; Burkett, K.; Butler, J. N.; Canepa, A.; Cheung, H. W. K.; Chramowicz, J.; Christian, D.; Cooper, W. E.; Deptuch, G.; Derylo, G.; Gingu, C.; Grünendahl, S.; Hasegawa, S.; Hoff, J.; Howell, J.; Hrycyk, M.; Jindariani, S.; Johnson, M.; Kahlid, F.; Lei, C. M.; Lipton, R.; Lopes De Sá, R.; Liu, T.; Los, S.; Matulik, M.; Merkel, P.; Nahn, S.; Prosser, A.; Rivera, R.; Schneider, B.; Sellberg, G.; Shenai, A.; Spiegel, L.; Tran, N.; Uplegger, L.; Voirin, E.; Berry, D. R.; Chen, X.; Ennesser, L.; Evdokimov, A.; Evdokimov, O.; Gerber, C. E.; Hofman, D. J.; Makauda, S.; Mills, C.; Sandoval Gonzalez, I. D.; Alimena, J.; Antonelli, L. J.; Francis, B.; Hart, A.; Hill, C. S.; Parashar, N.; Stupak, J.; Bortoletto, D.; Bubna, M.; Hinton, N.; Jones, M.; Miller, D. H.; Shi, X.; Tan, P.; Baringer, P.; Bean, A.; Khalil, S.; Kropivnitskaya, A.; Majumder, D.; Wilson, G.; Ivanov, A.; Mendis, R.; Mitchell, T.; Skhirtladze, N.; Taylor, R.; Anderson, I.; Fehling, D.; Gritsan, A.; Maksimovic, P.; Martin, C.; Nash, K.; Osherson, M.; Swartz, M.; Xiao, M.; Bloom, K.; Claes, D. R.; Fangmeier, C.; Gonzalez Suarez, R.; Monroy, J.; Siado, J.; Hahn, K.; Sevova, S.; Sung, K.; Trovato, M.; Bartz, E.; Gershtein, Y.; Halkiadakis, E.; Kyriacou, S.; Lath, A.; Nash, K.; Osherson, M.; Schnetzer, S.; Stone, R.; Walker, M.; Malik, S.; Norberg, S.; Ramirez Vargas, J. E.; Alyari, M.; Dolen, J.; Godshalk, A.; Harrington, C.; Iashvili, I.; Kharchilava, A.; Nguyen, D.; Parker, A.; Rappoccio, S.; Roozbahani, B.; Alexander, J.; Chaves, J.; Chu, J.; Dittmer, S.; McDermott, K.; Mirman, N.; Rinkevicius, A.; Ryd, A.; Salvati, E.; Skinnari, L.; Soffi, L.; Tao, Z.; Thom, J.; Tucker, J.; Zientek, M.; Akgün, B.; Ecklund, K. M.; Kilpatrick, M.; Nussbaum, T.; Zabel, J.; Betchart, B.; Covarelli, R.; Demina, R.; Hindrichs, O.; Petrillo, G.; Eusebi, R.; Osipenkov, I.; Perloff, A.; Ulmer, K. A.

    2017-06-01

    The upgrade of the LHC to the High-Luminosity LHC (HL-LHC) is expected to increase the LHC design luminosity by an order of magnitude. This will require silicon tracking detectors with a significantly higher radiation hardness. The CMS Tracker Collaboration has conducted an irradiation and measurement campaign to identify suitable silicon sensor materials and strip designs for the future outer tracker at the CMS experiment. Based on these results, the collaboration has chosen to use n-in-p type silicon sensors and focus further investigations on the optimization of that sensor type. This paper describes the main measurement results and conclusions that motivated this decision.

  15. Microhardness of carbon-doped (111) p-type Czochralski silicon

    NASA Technical Reports Server (NTRS)

    Danyluk, S.; Lim, D. S.; Kalejs, J.

    1985-01-01

    The effect of carbon on (111) p-type Czochralski silicon is examined. The preparation of the silicon and microhardness test procedures are described, and the equation used to determine microhardness from indentations in the silicon wafers is presented. The results indicate that as the carbon concentration in the silicon increases the microhardness increases. The linear increase in microhardness is the result of carbon hindering dislocation motion, and the effect of temperature on silicon deformation and dislocation mobility is explained. The measured microhardness was compared with an analysis which is based on dislocation pinning by carbon; a good correlation was observed. The Labusch model for the effect of pinning sites on dislocation motion is given.

  16. Microhardness of carbon-doped (111) p-type Czochralski silicon

    NASA Technical Reports Server (NTRS)

    Danyluk, S.; Lim, D. S.; Kalejs, J.

    1985-01-01

    The effect of carbon on (111) p-type Czochralski silicon is examined. The preparation of the silicon and microhardness test procedures are described, and the equation used to determine microhardness from indentations in the silicon wafers is presented. The results indicate that as the carbon concentration in the silicon increases the microhardness increases. The linear increase in microhardness is the result of carbon hindering dislocation motion, and the effect of temperature on silicon deformation and dislocation mobility is explained. The measured microhardness was compared with an analysis which is based on dislocation pinning by carbon; a good correlation was observed. The Labusch model for the effect of pinning sites on dislocation motion is given.

  17. Dual ohmic contact to N- and P-type silicon carbide

    NASA Technical Reports Server (NTRS)

    Okojie, Robert S. (Inventor)

    2013-01-01

    Simultaneous formation of electrical ohmic contacts to silicon carbide (SiC) semiconductor having donor and acceptor impurities (n- and p-type doping, respectively) is disclosed. The innovation provides for ohmic contacts formed on SiC layers having n- and p-doping at one process step during the fabrication of the semiconductor device. Further, the innovation provides a non-discriminatory, universal ohmic contact to both n- and p-type SiC, enhancing reliability of the specific contact resistivity when operated at temperatures in excess of 600.degree. C.

  18. Thermal model for breakdown in p-type hydrogenated amorphous silicon films with coplanar electrodes

    NASA Astrophysics Data System (ADS)

    Avila, A.; Asomoza, R.

    2000-09-01

    p-Type glow discharge hydrogenated amorphous silicon films with nearly placed (˜5 μm) coplanar metallic electrodes were led to breakdown under the effect of voltage bias. Non-ohmicity in the I- V plot was analyzed in order to look for the transport mechanism helping to produce breakdown in the films. A thermal model is shown to fit reasonably the electrical behavior of samples prior to breakdown. Two parts are developed in this approximation: the first one assumes that during the initial homogeneous heating of the semiconductor due to Joule effect, stationary states are reached. The heat is assumed to dissipate from the metallic contacts through a Newton's convection mechanism. From the experimental data and the model proposed, the I- V plot is fitted, the heat transfer area and constant are calculated and the temperature-voltage plot is determined. In the second part, the heat conduction equation along the distance between the contacts is numerically solved in one dimension with this information. The result provides an estimate of the time required by the sample to reach a certain steady-state limiting temperature above which much faster heating produces breakdown. This time correlates well to the delay time reported in the literature.

  19. Charge collection measurements with p-type Magnetic Czochralski silicon single pad detectors

    NASA Astrophysics Data System (ADS)

    Tosi, C.; Bruzzi, M.; Macchiolo, A.; Scaringella, M.; Petterson, M. K.; Sadrozinski, H. F.-W.; Betancourt, C.; Manna, N.; Creanza, D.; Boscardin, M.; Piemonte, C.; Zorzi, N.; Borrello, L.; Messineo, A.

    2007-09-01

    The charge collected from beta source particles in single pad detectors produced on p-type Magnetic Czochralski (MCz) silicon wafers has been measured before and after irradiation with 26 MeV protons. After a 1 MeV neutron equivalent fluence of 1×1015 cm-2 the collected charge is reduced to 77% at bias voltages below 900 V. This result is compared with previous results from charge collection measurements.

  20. Hole transport through proton-irradiated p-type silicon wafers during electrochemical anodization

    SciTech Connect

    Breese, M. B. H.; Champeaux, F. J. T.; Bettiol, A. A.; Teo, E. J.; Blackwood, D. J.

    2006-01-15

    The hole current density flowing through and around proton-irradiated areas of p-type silicon during electrochemical anodization is simulated and studied experimentally using scanning electron microscopy and photoluminescence imaging. It is shown that for certain irradiation geometries the current flow may be either reduced or enhanced in areas adjacent to irradiated lines, resulting in enhanced or reduced rates of porous silicon formation and corresponding changes in photoluminescence intensity and feature height. The current flow to the surface is unaffected by both the beam straggle and the high defect density at the end of ion range, enabling feature dimensions of {approx}200 nm to be attained. This study has enabled fabrication of micromachined and patterned porous silicon structures in anodized wafers with accurate control of feature dimensions, layer thickness, and photoluminescence emission wavelength and intensity.

  1. Empirical model predicting the layer thickness and porosity of p-type mesoporous silicon

    NASA Astrophysics Data System (ADS)

    Wolter, Sascha J.; Geisler, Dennis; Hensen, Jan; Köntges, Marc; Kajari-Schröder, Sarah; Bahnemann, Detlef W.; Brendel, Rolf

    2017-04-01

    Porous silicon is a promising material for a wide range of applications because of its versatile layer properties and the convenient preparation by electrochemical etching. Nevertheless, the quantitative dependency of the layer thickness and porosity on the etching process parameters is yet unknown. We have developed an empirical model to predict the porosity and layer thickness of p-type mesoporous silicon prepared by electrochemical etching. The impact of the process parameters such as current density, etching time and concentration of hydrogen fluoride is evaluated by ellipsometry. The main influences on the porosity of the porous silicon are the current density, the etching time and their product while the etch rate is dominated by the current density, the concentration of hydrogen fluoride and their product. The developed model predicts the resulting layer properties of a certain porosification process and can, for example be used to enhance the utilization of the employed chemicals.

  2. Hydrogen diffusion at moderate temperatures in p-type Czochralski silicon

    SciTech Connect

    Huang, Y.L.; Ma, Y.; Job, R.; Ulyashin, A.G.

    2004-12-15

    In plasma-hydrogenated p-type Czochralski silicon, rapid thermal donor (TD) formation is achieved, resulting from the catalytic support of hydrogen. The n-type counter doping by TD leads to a p-n junction formation. A simple method for the indirect determination of the diffusivity of hydrogen via applying the spreading resistance probe measurements is presented. Hydrogen diffusion in silicon during both plasma hydrogenation and post-hydrogenation annealing is investigated. The impact of the hydrogenation duration, annealing temperature, and resistivity of the silicon wafers on the hydrogen diffusion is discussed. Diffusivities of hydrogen are determined in the temperature range 270-450 deg. C. The activation energy for the hydrogen diffusion is deduced to be 1.23 eV. The diffusion of hydrogen is interpreted within the framework of a trap-limited diffusion mechanism. Oxygen and hydrogen are found to be the main traps.

  3. Microhardness studies on thin carbon films grown on P-type, (100) silicon

    NASA Technical Reports Server (NTRS)

    Kolecki, J. C.

    1982-01-01

    A program to grow thin carbon films and investigate their physical and electrical properties is described. Characteristics of films grown by rf sputtering and vacuum arc deposition on p type, (100) silicon wafers are presented. Microhardness data were obtained from both the films and the silicon via the Vickers diamond indentation technique. These data show that the films are always harder than the silicon, even when the films are thin (of the order of 1000 A). Vacuum arc films were found to contain black carbon inclusions of the order of a few microns in size, and clusters of inclusions of the order of tens of microns. Transmission electron diffraction showed that the films being studied were amorphous in structure.

  4. P-Type Silicon Strip Sensors for the new CMS Tracker at HL-LHC

    DOE PAGES

    Adam, W.; Bergauer, T.; Brondolin, E.; ...

    2017-06-27

    The upgrade of the LHC to the High-Luminosity LHC (HL-LHC) is expected to increase the LHC design luminosity by an order of magnitude. This will require silicon tracking detectors with a significantly higher radiation hardness. The CMS Tracker Collaboration has conducted an irradiation and measurement campaign to identify suitable silicon sensor materials and strip designs for the future outer tracker at the CMS experiment. Based on these results, the collaboration has chosen to use n-in-p type silicon sensors and focus further investigations on the optimization of that sensor type. Furthermore, this paper describes the main measurement results and conclusions thatmore » motivated this decision.« less

  5. Ultrathin polytyramine films by electropolymerisation on highly doped p-type silicon electrodes

    NASA Astrophysics Data System (ADS)

    Losic, Dusan; Cole, Martin; Thissen, Helmut; Voelcker, Nicolas H.

    2005-06-01

    In recent years, silicon-based materials have been used extensively in device fabrication for sensors, microfluidic and biomaterial applications. In order to enhance the performance of the material, a number of surface functionalisations are employed. However, until now, silicon has not been used as an electrode material for electrodeposition of functional polymers. Here, highly doped p-type silicon was used as an electrode facilitating the electropolymerisation of ultrathin polytyramine (PT) films by cyclic voltammetry. The influence of resistivity, pre-treatment of the silicon surface and electrochemical conditions on the electropolymerisation process was studied. The results show that ultrathin PT films with a controlled thickness from 2 to 15 nm exhibit good electrochemical stability in buffer solution (pH 6.8) over a large potential window (-1.5 V to 1.5 V) and passivating properties towards a redox probe. In terms of the film morphology, a pinhole-free smooth surface with a roughness below 0.5 nm and with dominantly globular features of 40-60 nm diameter was observed by AFM. XPS characterisation showed that PT films display amine functional groups at the coating surface. UV induced silicon oxidation was used to prepare patterned PT films.

  6. Direct Measurement of Electron Beam Induced Currents in p-type Silicon

    SciTech Connect

    Han, M.G.; Zhu, Y.; Sasaki, K.; Kato, T.; Fisher, C.A.J.; Hirayama, T.

    2010-08-01

    A new method for measuring electron beam induced currents (EBICs) in p-type silicon using a transmission electron microscope (TEM) with a high-precision tungsten probe is presented. Current-voltage (I-V) curves obtained under various electron-beam illumination conditions are found to depend strongly on the current density of the incoming electron beam and the relative distance of the beam from the point of probe contact, consistent with a buildup of excess electrons around the contact. This setup provides a new experimental approach for studying minority carrier transport in semiconductors on the nanometer scale.

  7. Investigation on the structural characterization of pulsed p-type porous silicon

    NASA Astrophysics Data System (ADS)

    Wahab, N. H. Abd; Rahim, A. F. Abd; Mahmood, A.; Yusof, Y.

    2017-08-01

    P-type Porous silicon (PS) was sucessfully formed by using an electrochemical pulse etching (PC) and conventional direct current (DC) etching techniques. The PS was etched in the Hydrofluoric (HF) based solution at a current density of J = 10 mA/cm2 for 30 minutes from a crystalline silicon wafer with (100) orientation. For the PC process, the current was supplied through a pulse generator with 14 ms cycle time (T) with 10 ms on time (Ton) and pause time (Toff) of 4 ms respectively. FESEM, EDX, AFM, and XRD have been used to characterize the morphological properties of the PS. FESEM images showed that pulse PS (PPC) sample produces more uniform circular structures with estimated average pore sizes of 42.14 nm compared to DC porous (PDC) sample with estimated average size of 16.37nm respectively. The EDX spectrum for both samples showed higher Si content with minimal presence of oxide.

  8. Lateral photovoltaic effect in p-type silicon induced by surface states

    NASA Astrophysics Data System (ADS)

    Huang, Xu; Mei, Chunlian; Gan, Zhikai; Zhou, Peiqi; Wang, Hui

    2017-03-01

    A colossal lateral photovoltaic effect (LPE) was observed at the surface of p-type silicon, which differs from the conventional thought that a large LPE is only observed in Schottky junctions and PN junctions consisting of several layers with different conductivities. It shows a high sensitivity of 499.24 mV/mm and an ultra-broadband spectral responsivity (from 405 nm to 980 nm) at room temperature, which makes it an attractive candidate for near-infrared detection. We propose that this phenomenon can be understood by considering the surface band bending near the surface of p-Si induced by charged surface states. The energy band diagrams of the samples are shown based on X-ray photoelectron spectroscopy suggesting the correlation between the LPE and surface band bending. The conjectures are validated by changing the surface states of p-type silicon using Ni nano-films. These findings reveal a generation mechanism of the LPE and may lead to p-Si based, broadband-responsivity, low-cost, and high-precision optical and optoelectronic applications.

  9. Effective surface passivation of p-type crystalline silicon with silicon oxides formed by light-induced anodisation

    NASA Astrophysics Data System (ADS)

    Cui, Jie; Grant, Nicholas; Lennon, Alison

    2014-12-01

    Electronic surface passivation of p-type crystalline silicon by anodic silicon dioxide (SiO2) was investigated. The anodic SiO2 was grown by light-induced anodisation (LIA) in diluted sulphuric acid at room temperature, a process that is significantly less-expensive than thermal oxidation which is widely-used in silicon solar cell fabrication. After annealing in oxygen and then forming gas at 400 °C for 30 min, the effective minority carrier lifetime of 3-5 Ω cm, boron-doped Czochralski silicon wafers with a phosphorus-doped 80 Ω/□ emitter and a LIA anodic SiO2 formed on the p-type surface was increased by two orders of magnitude to 150 μs. Capacitance-voltage measurements demonstrated a very low positive charge density of 3.4 × 1011 cm-2 and a moderate density of interface states of 6 × 1011 eV-1 cm-2. This corresponded to a silicon surface recombination velocity of 62 cm s-1, which is comparable with values reported for other anodic SiO2 films, which required higher temperatures and longer growth times, and significantly lower than oxides grown by chemical vapour deposition techniques. Additionally, a very low leakage current density of 3.5 × 10-10 and 1.6 × 10-9 A cm-2 at 1 and -1 V, respectively, was measured for LIA SiO2 suggesting its potential application as insulation layer in IBC solar cells and a barrier for potential induced degradation.

  10. Accelerated light-induced degradation for detecting copper contamination in p-type silicon

    SciTech Connect

    Inglese, Alessandro Savin, Hele; Lindroos, Jeanette

    2015-08-03

    Copper is a harmful metal impurity that significantly impacts the performance of silicon-based devices if present in active regions. In this contribution, we propose a fast method consisting of simultaneous illumination and annealing for the detection of copper contamination in p-type silicon. Our results show that, within minutes, such method is capable of producing a significant reduction of the minority carrier lifetime. A spatial distribution map of copper contamination can then be obtained through the lifetime values measured before and after degradation. In order to separate the effect of the light-activated copper defects from the other metastable complexes in low resistivity Cz-silicon, we carried out a dark anneal at 200 °C, which is known to fully recover the boron-oxygen defect. Similar to the boron-oxygen behavior, we show that the dark anneal also recovers the copper defects. However, the recovery is only partial and it can be used to identify the possible presence of copper contamination.

  11. Fabrication of p-type porous silicon nanowire with oxidized silicon substrate through one-step MACE

    SciTech Connect

    Li, Shaoyuan; Ma, Wenhui; Zhou, Yang; Chen, Xiuhua; Xiao, Yongyin; Ma, Mingyu; Wei, Feng; Yang, Xi

    2014-05-01

    In this paper, the simple pre-oxidization process is firstly used to treat the starting silicon wafer, and then MPSiNWs are successfully fabricated from the moderately doped wafer by one-step MACE technology in HF/AgNO{sub 3} system. The PL spectrum of MPSiNWs obtained from the oxidized silicon wafers show a large blue-shift, which can be attributed to the deep Q. C. effect induced by numerous mesoporous structures. The effects of HF and AgNO{sub 3} concentration on formation of SiNWs were carefully investigated. The results indicate that the higher HF concentration is favorable to the growth of SiNWs, and the density of SiNWs is significantly reduced when Ag{sup +} ions concentrations are too high. The deposition behaviors of Ag{sup +} ions on oxidized and unoxidized silicon surface were studied. According to the experimental results, a model was proposed to explain the formation mechanism of porous SiNWs by etching the oxidized starting silicon. - Graphical abstract: Schematic cross-sectional views of PSiNWs array formation by etching oxidized silicon wafer in HF/AgNO{sub 3} solution. (A) At the starting point; (B) during the etching process; and (C) after Ag dendrites remove. - Highlights: • Prior to etching, a simple pre-oxidation is firstly used to treat silicon substrate. • The medially doped p-type MPSiNWs are prepared by one-step MACE. • Deposition behaviors of Ag{sup +} ions on oxidized and unoxidized silicon are studied. • A model is finally proposed to explain the formation mechanism of PSiNWs.

  12. Percolation network in resistive switching devices with the structure of silver/amorphous silicon/p-type silicon

    SciTech Connect

    Liu, Yanhong; Gao, Ping; Bi, Kaifeng; Peng, Wei; Jiang, Xuening; Xu, Hongxia

    2014-01-27

    Conducting pathway of percolation network was identified in resistive switching devices (RSDs) with the structure of silver/amorphous silicon/p-type silicon (Ag/a-Si/p-Si) based on its gradual RESET-process and the stochastic complex impedance spectroscopy characteristics (CIS). The formation of the percolation network is attributed to amounts of nanocrystalline Si particles as well as defect sites embedded in a-Si layer, in which the defect sites supply positions for Ag ions to nucleate and grow. The similar percolation network has been only observed in Ag-Ge-Se based RSD before. This report provides a better understanding for electric properties of RSD based on the percolation network.

  13. Quantitative copper measurement in oxidized p-type silicon wafers using microwave photoconductivity decay

    NASA Astrophysics Data System (ADS)

    Väinölä, H.; Saarnilehto, E.; Yli-Koski, M.; Haarahiltunen, A.; Sinkkonen, J.; Berenyi, G.; Pavelka, T.

    2005-07-01

    We propose a method to measure trace copper contamination in p-type silicon using the microwave photoconductivity decay (μ-PCD) technique. The method is based on the precipitation of interstitial copper, activated by high-intensity light, which results in enhanced minority carrier recombination activity. We show that there is a quantitative correlation between the enhanced recombination rate and the Cu concentration by comparing μ-PCD measurements with transient ion drift and total reflection x-ray fluorescence measurements. The results indicate that the method is capable of measuring Cu concentrations down to 1010cm-3. There are no limitations to wafer storage time if corona charge is used on the oxidized wafer surfaces as the charge prevents copper outdiffusion. We briefly discuss the role of oxide precipitates both in the copper precipitation and in the charge carrier recombination processes.

  14. Light Activated Copper Defects in P-Type Silicon Studied by PCD

    NASA Astrophysics Data System (ADS)

    Yli-Koski, M.; Väinölä, H.; Haarahiltunen, A.; Storgårds, J.; Saarnilehto, E.; Sinkkonen, J.

    2004-01-01

    We have studied copper defects in p-type silicon by measuring its precipitation kinetics by means of the microwave photoconductive decay (µPCD) technique. Copper atoms precipitated during high intensity light treatment at room temperature. We used the total reflection X-ray fluorescence (TXRF) and the transient ion drift (TID) techniques to determine the bulk concentration of copper. We estimated the density and the radius of the copper precipitates as well as the average capture cross-section for precipitated copper atoms from the measured copper precipitation time constant, bulk concentration of copper, and the change in the recombination rate. We also studied how the density of oxygen defect affects the copper precipitation. Our results show that copper precipitates at two different kinds of defects.

  15. DLTS study of defects in hydrogen plasma treated p-type silicon

    NASA Astrophysics Data System (ADS)

    Wu, L.; Leitch, A. W. R.

    2001-12-01

    A deep level transient spectroscopy (DLTS) study of defects found in float-zone p-type silicon exposed to a DC hydrogen plasma is reported. DLTS measurements of these samples revealed three deep levels. Two of the levels are broad, with ET- EV in the range 0.34-0.39 eV (H2) and 0.40-0.44 eV (H3); these appear as bands in the Arrhenius plot. The third level has an activation energy of 0.09 eV (H1). The variations in the capture cross-sections of H2 and H3 are believed to be strain-related. The concentration of H3 exceeds the other two levels and decreases rapidly into the samples with ∼10 15 cm -3 at a depth of 0.20 μm. H3 is tentatively ascribed to an extended defect.

  16. Evidence for an iron-hydrogen complex in p-type silicon

    SciTech Connect

    Leonard, S. Markevich, V. P.; Peaker, A. R.; Hamilton, B.; Murphy, J. D.

    2015-07-20

    Interactions of hydrogen with iron have been studied in Fe contaminated p-type Czochralski silicon using capacitance-voltage profiling and deep level transient spectroscopy (DLTS). Hydrogen has been introduced into the samples from a silicon nitride layer grown by plasma enhanced chemical vapor deposition. After annealing of the Schottky diodes on Si:Fe + H samples under reverse bias in the temperature range of 90–120 °C, a trap has been observed in the DLTS spectra which we have assigned to a Fe-H complex. The trap is only observed when a high concentration of hydrogen is present in the near surface region. The trap concentration is higher in samples with a higher concentration of single interstitial Fe atoms. The defect has a deep donor level at E{sub v} + 0.31 eV. Direct measurements of capture cross section of holes have shown that the capture cross section is not temperature dependent and its value is 5.2 × 10{sup −17} cm{sup 2}. It is found from an isochronal annealing study that the Fe-H complex is not very stable and can be eliminated completely by annealing for 30 min at 125 °C.

  17. Evidence for an iron-hydrogen complex in p-type silicon

    NASA Astrophysics Data System (ADS)

    Leonard, S.; Markevich, V. P.; Peaker, A. R.; Hamilton, B.; Murphy, J. D.

    2015-07-01

    Interactions of hydrogen with iron have been studied in Fe contaminated p-type Czochralski silicon using capacitance-voltage profiling and deep level transient spectroscopy (DLTS). Hydrogen has been introduced into the samples from a silicon nitride layer grown by plasma enhanced chemical vapor deposition. After annealing of the Schottky diodes on Si:Fe + H samples under reverse bias in the temperature range of 90-120 °C, a trap has been observed in the DLTS spectra which we have assigned to a Fe-H complex. The trap is only observed when a high concentration of hydrogen is present in the near surface region. The trap concentration is higher in samples with a higher concentration of single interstitial Fe atoms. The defect has a deep donor level at Ev + 0.31 eV. Direct measurements of capture cross section of holes have shown that the capture cross section is not temperature dependent and its value is 5.2 × 10-17 cm2. It is found from an isochronal annealing study that the Fe-H complex is not very stable and can be eliminated completely by annealing for 30 min at 125 °C.

  18. RF performances of inductors integrated on localized p+-type porous silicon regions

    NASA Astrophysics Data System (ADS)

    Capelle, Marie; Billoué, Jérôme; Poveda, Patrick; Gautier, Gaël

    2012-09-01

    To study the influence of localized porous silicon regions on radiofrequency performances of passive devices, inductors were integrated on localized porous silicon regions, full porous silicon sheet, bulk silicon and glass substrates. In this work, a novel strong, resistant fluoropolymer mask is introduced to localize the porous silicon on the silicon wafer. Then, the quality factors and resonant frequencies obtained with the different substrates are presented. A first comparison is done between the performances of inductors integrated on same-thickness localized and full porous silicon sheet layers. The effect of the silicon regions in the decrease of performances of localized porous silicon is discussed. Then, the study shows that the localized porous silicon substrate significantly reduces losses in comparison with high-resistivity silicon or highly doped silicon bulks. These results are promising for the integration of both passive and active devices on the same silicon/porous silicon hybrid substrate.

  19. Precipitates and hydrogen passivation at crystal defects in n- and p-type multicrystalline silicon

    NASA Astrophysics Data System (ADS)

    Geerligs, L. J.; Komatsu, Y.; Röver, I.; Wambach, K.; Yamaga, I.; Saitoh, T.

    2007-11-01

    The effects of phosphorous gettering and hydrogenation on the minority carrier recombination at crystal defects in directionally solidified multicrystalline silicon are described. Representative industrial wafers, both p- and n-type, and current technologies for the gettering and hydrogenation are used. The main result of this work is a strong link between activation of extended crystal defects (ECDs) by gettering and their passivation by hydrogenation. It is shown that gettering or annealing increases the recombination at active as well as inactive ECDs. Surprisingly, hydrogenation can neutralize this change in activity due to the gettering. However, it neutralizes only part, at most, of the ECD activity already present before the gettering. Therefore, under current industrial processing techniques, these two high-temperature process steps individually give large change but together much less net change of the crystal defect activity. Related phenomena are observed in wafers with strongly varying impurity concentration. Finally, there is little difference in these observations between n- and p-type wafers.

  20. Comparative study of mobility extraction methods in p-type polycrystalline silicon thin film transistors

    NASA Astrophysics Data System (ADS)

    Liu, Kai; Liu, Yuan; Liu, Yu-Rong; En, Yun-Fei; Li, Bin

    2017-07-01

    Channel mobility in the p-type polycrystalline silicon thin film transistors (poly-Si TFTs) is extracted using Hoffman method, linear region transconductance method and multi-frequency C-V method. Due to the non-negligible errors when neglecting the dependence of gate-source voltage on the effective mobility, the extracted mobility results are overestimated using linear region transconductance method and Hoffman method, especially in the lower gate-source voltage region. By considering of the distribution of localized states in the band-gap, the frequency independent capacitance due to localized charges in the sub-gap states and due to channel free electron charges in the conduction band were extracted using multi-frequency C-V method. Therefore, channel mobility was extracted accurately based on the charge transport theory. In addition, the effect of electrical field dependent mobility degradation was also considered in the higher gate-source voltage region. In the end, the extracted mobility results in the poly-Si TFTs using these three methods are compared and analyzed.

  1. Value Proposition for High Lifetime (p-type) and Thin Silicon Materials in Solar PV Applications: Preprint

    SciTech Connect

    Goodrich, A.; Woodhouse, M.; Hacke, P.

    2012-06-01

    Most silicon PV road maps forecast a continued reduction in wafer thickness, despite rapid declines in the primary incentive for doing so -- polysilicon feedstock price. Another common feature of most silicon-technology forecasts is the quest for ever-higher device performance at the lowest possible costs. The authors present data from device-performance and manufacturing- and system-installation cost models to quantitatively establish the incentives for manufacturers to pursue advanced (thin) wafer and (high efficiency) cell technologies, in an age of reduced feedstock prices. This analysis exhaustively considers the value proposition for high lifetime (p-type) silicon materials across the entire c-Si PV supply chain.

  2. Precipitation of Cu and Ni in n- and p-type Czochralski-grown silicon characterized by photoluminescence imaging

    NASA Astrophysics Data System (ADS)

    Sun, Chang; Nguyen, Hieu T.; Rougieux, Fiacre E.; Macdonald, Daniel

    2017-02-01

    Photoluminescence (PL) images and micro-PL maps were taken on Cu- or Ni-doped monocrystalline silicon wafers, to investigate the distribution of the metal precipitates. Several n-type and p-type wafers were used in which Cu or Ni were introduced in the starting melt of the ingots and precipitated during the ingot cooling (as opposed to surface contamination). The micro-PL mapping allowed investigation of the metal precipitates with a higher spatial resolution. Markedly different precipitation patterns were observed in n- and p-type samples: in both Cu- and Ni-doped n-type samples, circular central regions and edge regions were observed. In these regions, particles were distributed randomly and homogeneously. In the p-type Cu-doped and Ni-doped samples, by contrast, the precipitates occurred in lines along <110> orientations. The difference in the precipitation behaviour in n- and p-type samples is conjectured to be caused by different concentrations of self-interstitials and vacancies remaining in the crystal during the ingot cooling: there are more vacancies in the n-type ingots but more interstitials in the p-type ingots. The dopant effects on the intrinsic point defect concentrations in silicon crystals and possible precipitation mechanisms are discussed based on the findings in this work and the literature.

  3. Surface States and Effective Surface Area on Photoluminescent P-Type Porous Silicon

    NASA Technical Reports Server (NTRS)

    Weisz, S. Z.; Porras, A. Ramirez; Resto, O.; Goldstein, Y.; Many, A.; Savir, E.

    1997-01-01

    The present study is motivated by the possibility of utilizing porous silicon for spectral sensors. Pulse measurements on the porous-Si/electrolyte system are employed to determine the surface effective area and the surface-state density at various stages of the anodization process used to produce the porous material. Such measurements were combined with studies of the photoluminescence spectra. These spectra were found to shift progressively to the blue as a function of anodization time. The luminescence intensity increases initially with anodization time, reaches a maximum and then decreases with further anodization. The surface state density, on the other hand, increases with anodization time from an initial value of about 2 x 10(exp 12)/sq cm surface to about 1013 sq cm for the anodized surface. This value is attained already after -2 min anodization and upon further anodization remains fairly constant. In parallel, the effective surface area increases by a factor of 10-30. This behavior is markedly different from the one observed previously for n-type porous Si.

  4. Enhancement of minority carrier lifetimes in n- and p-type silicon wafers using silver nanoparticle layers

    NASA Astrophysics Data System (ADS)

    Thouti, Eshwar; Kumar, Sanjai; Komarala, Vamsi K.

    2016-01-01

    The quasi-steady state photo conductance technique is employed to probe effective minority carrier lifetime (τ eff) modifications after integrating silver nanoparticles (Ag NPs) on n-type and p-type silicon wafers with a native oxide surface. Our observations reveal that τ eff modification is very sensitive to Ag NPs size, surface coverage and also wafer type. With an optimized Ag NPs, τ eff is enhanced from 4.4 μs to 10 μs for a p-type silicon wafer, and from 8.1 μs to 14 μs for an n-type silicon wafer. We attributed the enhancement in τ eff to the partial field effect passivation of the silicon surface by the surface plasmon resonance near-fields of Ag NPs after excitation. Our investigations demonstrate that an optimized Ag NPs on any silicon wafer with a native oxide layer can work as both a light trapping and a surface-passivating layer.

  5. Numerical Simulation of Radiation Damage Effects in p-Type and n-Type FZ Silicon Detectors

    NASA Astrophysics Data System (ADS)

    Petasecca, M.; Moscatelli, F.; Passeri, D.; Pignatel, G. U.

    2006-10-01

    In the framework of the CERN-RD50 Collaboration, the adoption of p-type substrates has been proposed as a suitable mean to improve the radiation hardness of silicon detectors up to fluencies of 1times10 16 n/cm2. In this work two numerical simulation models will be presented for p-type and n-type silicon detectors, respectively. A comprehensive analysis of the variation of the effective doping concentration (Neff), the leakage current density and the charge collection efficiency as a function of the fluence has been performed using the Synopsys T-CAD device simulator. The simulated electrical characteristics of irradiated detectors have been compared with experimental measurements extracted from the literature, showing a very good agreement. The predicted behaviour of p-type silicon detectors after irradiation up to 1016 n/cm2 shows better results in terms of charge collection efficiency and full depletion voltage, with respect to n-type material, while comparable behaviour has been observed in terms of leakage current density

  6. Reflectance modeling of electrochemically P-type porosified silicon by Drude-Lorentz model

    NASA Astrophysics Data System (ADS)

    Kadi, M.; Media, E. M.; Gueddaoui, H.; Outemzabet, R.

    2014-09-01

    Porous silicon remains a promising material for optoelectronic application; in this field monitoring of the refractive index profile of the porous layer is required. We present in this work a procedure based on Drude-Lorentz model for calculating the optical parameters such as the high- and low-frequency dielectric constants, the plasma frequency by fitting the reflectance spectra. The experimental data of different porous silicon layer created above the bulk silicon material by electrochemical etching are extracted from reflectance measurements. The reflectance spectra are recorded in the spectral range 350-2500 nm. First, our computational procedure has been validated by its application on mono-crystalline silicon for the determination of its optical parameters. A good agreement between our results and those found in other works has been achieved in the visible-NIR range. In the second step, the model was applied to porous silicon (PS) layers. Useful optical parameters like the refractive index and the extinction coefficient, respectively, n (λ) and κ(λ), the band gap Eg, of different fabricated porous silicon layer are determined from simulated reflectance spectra. The correlation between the optical properties and the conditions of the electrochemical treatment was observed and analyzed. The main conclusion is that the reflected light from the porous silicon surface, although non-homogeneous and thus possessing the light scattering, is essentially smaller than the reflected light from the bulk crystalline silicon. These results show that the porous surface layer can act as an antireflection coating for silicon and could be used, in particular, in solar cells.

  7. Macropore formation in p-type silicon: toward the modeling of morphology

    PubMed Central

    2014-01-01

    The formation of macropores in silicon during electrochemical etching processes has attracted much interest. Experimental evidences indicate that charge transport in silicon and in the electrolyte should realistically be taken into account in order to be able to describe the macropore morphology. However, up to now, none of the existing models has the requested degree of sophistication to reach such a goal. Therefore, we have undertaken the development of a mathematical model (phase-field model) to describe the motion and shape of the silicon/electrolyte interface during anodic dissolution. It is formulated in terms of the fundamental expression for the electrochemical potential and contains terms which describe the process of silicon dissolution during electrochemical attack in a hydrofluoric acid (HF) solution. It should allow us to explore the influence of the physical parameters on the etching process and to obtain the spatial profiles across the interface of various quantities of interest, such as the hole concentration, the current density, or the electrostatic potential. As a first step, we find that this model correctly describes the space charge region formed at the silicon side of the interface. PMID:25386103

  8. Macropore formation in p-type silicon: toward the modeling of morphology.

    PubMed

    Slimani, Amel; Iratni, Aicha; Henry, Hervé; Plapp, Mathis; Chazalviel, Jean-Noël; Ozanam, François; Gabouze, Noureddine

    2014-01-01

    The formation of macropores in silicon during electrochemical etching processes has attracted much interest. Experimental evidences indicate that charge transport in silicon and in the electrolyte should realistically be taken into account in order to be able to describe the macropore morphology. However, up to now, none of the existing models has the requested degree of sophistication to reach such a goal. Therefore, we have undertaken the development of a mathematical model (phase-field model) to describe the motion and shape of the silicon/electrolyte interface during anodic dissolution. It is formulated in terms of the fundamental expression for the electrochemical potential and contains terms which describe the process of silicon dissolution during electrochemical attack in a hydrofluoric acid (HF) solution. It should allow us to explore the influence of the physical parameters on the etching process and to obtain the spatial profiles across the interface of various quantities of interest, such as the hole concentration, the current density, or the electrostatic potential. As a first step, we find that this model correctly describes the space charge region formed at the silicon side of the interface.

  9. Hot-wire chemical vapor deposition prepared aluminum doped p-type microcrystalline silicon carbide window layers for thin film silicon solar cells

    NASA Astrophysics Data System (ADS)

    Chen, Tao; Köhler, Florian; Heidt, Anna; Carius, Reinhard; Finger, Friedhelm

    2014-01-01

    Al-doped p-type microcrystalline silicon carbide (µc-SiC:H) thin films were deposited by hot-wire chemical vapor deposition at substrate temperatures below 400 °C. Monomethylsilane (MMS) highly diluted in hydrogen was used as the SiC source in favor of SiC deposition in a stoichiometric form. Aluminum (Al) introduced from trimethylaluminum (TMAl) was used as the p-type dopant. The material property of Al-doped p-type µc-SiC:H thin films deposited with different deposition pressure and filament temperature was investigated in this work. Such µc-SiC:H material is of mainly cubic (3C) SiC polytype. For certain conditions, like high deposition pressure and high filament temperature, additional hexagonal phase and/or stacking faults can be observed. P-type µc-SiC:H thin films with optical band gap E04 ranging from 2.0 to 2.8 eV and dark conductivity ranging from 10-5 to 0.1 S/cm can be prepared. Such transparent and conductive p-type µc-SiC:H thin films were applied in thin film silicon solar cells as the window layer, resulting in an improved quantum efficiency at wavelengths below 480 nm.

  10. The effect of dose rate dependence of p-type silicon detectors on linac relative dosimetry.

    PubMed

    Wilkins, D; Li, X A; Cygler, J; Gerig, L

    1997-06-01

    Cumulative radiation damage to silicon semiconductor diode detectors can induce dose rate dependent sensitivity, a concern in the pulsed beam of a linac. Two p-Si diode photon detectors were used in this study, diodes A and B. Both were preirradiated by the supplier to 5 kGy, with diode A receiving an estimated 8 kGy from measurements, and diode B, 25 kGy. At 6 MV, the PDD measured with diode B was lower (by 4.4% at a depth of 25 cm) than diode A. Using SSD to vary the dose per pulse from 0.02 to 0.64 mGy/pulse, diode A was dose rate independent (within 2%), while the sensitivity of diode B changed by 13%. Silicon diode detectors should be checked regularly against ionization chambers in the pulsed beam of a linac, especially older high-resistivity diodes that have accumulated dose from high-energy photon beams.

  11. Low resistance Ohmic contact to p-type crystalline silicon via nitrogen-doped copper oxide films

    SciTech Connect

    Zhang, Xinyu Wan, Yimao; Bullock, James; Allen, Thomas; Cuevas, Andres

    2016-08-01

    This work explores the application of transparent nitrogen doped copper oxide (CuO{sub x}:N) films deposited by reactive sputtering to create hole-selective contacts for p-type crystalline silicon (c-Si) solar cells. It is found that CuO{sub x}:N sputtered directly onto crystalline silicon is able to form an Ohmic contact. X-ray photoelectron spectroscopy and Raman spectroscopy measurements are used to characterise the structural and physical properties of the CuO{sub x}:N films. Both the oxygen flow rate and the substrate temperature during deposition have a significant impact on the film composition, as well as on the resulting contact resistivity. After optimization, a low contact resistivity of ∼10 mΩ cm{sup 2} has been established. This result offers significant advantages over conventional contact structures in terms of carrier transport and device fabrication.

  12. Light-induced degradation in p-type gallium co-doped solar grade multicrystalline silicon wafers and solar cells

    NASA Astrophysics Data System (ADS)

    Ren, Xianpei; Cai, Lihan; Fan, Baodian; Cheng, Haoran; Zheng, Songsheng; Chen, Chao

    2013-12-01

    This letter focuses on the evolution under illumination of the minority carrier lifetime and conversion efficiency of p-type gallium (Ga) co-doped solar grade multicrystalline silicon wafers and solar cells. We present experimental data regarding the concentration of boron-oxygen (B-O) defects in this silicon when subjected to illumination, and the concentration was found to depend on [B]-[P] rather than [B] or the net doping p0([B] + [Ga] - [P]). This result implies that the compensated B is unable to form the B-O defect. Minority carrier lifetime and EQE measurements at different degradation states indicate that the B-O defect and Fe-acceptor pairs are the two key centers contributed to LID in this material.

  13. Investigation of surface passivation schemes for p-type monocrystalline silicon solar cell

    NASA Astrophysics Data System (ADS)

    Rahman, Md. Momtazur; Udoy, Ariful Banna

    2016-10-01

    This paper represents an experiment to analyze the dark saturation current densities of passivated surfaces for monocrystalline silicon solar cells. The samples are diffused at peak temperatures of 800-950 °C. Basically, symmetrical lifetime samples with different doping profiles are prepared with alkaline textured and saw damage etched (planar) surfaces. After POCl3 diffusion, the phosphorous silicate glass layers are removed in a wet chemical etching step. Several designs are chosen for the determination of the sheet resistance ( R sh), the concentration profile for excess charge carrier and the minority carrier effective lifetime of the diffused surfaces. The dark saturation current densities ( J o ) and the doping profiles are determined accordingly via quasi-steady state photoconductance decay measurement and electrochemical capacitance-voltage measurement. Three different passivation schemes are investigated as follows: silicon nitride (SiN x ) deposited by plasma-enhanced chemical vapor deposition (PECVD) technique, silicon-rich oxynitride (SiriO x N y ) capped with a PECVD SiN x layer, and thin thermally grown oxide, capped with a PECVD SiN x layer.

  14. Ultrathin Passivation of P-type silicon Surface by Atomic Layer Deposited Gallium Oxide Thin Films

    NASA Astrophysics Data System (ADS)

    Wen, J.; Guo, L. Q.; Tao, J.

    2017-02-01

    Surface passivation performances of Ga2O3 thin films deposited on p-type Czochralski Si wafers by atomic layer deposition (ALD) were investigated as a function of post-deposition annealing conditions. Minority carrier lifetimes were characterized by Semilab WT-2000PVN lifetime tester. The average effective minority carrier lifetime can reduce to 218.09 μs after annealed treatment at the temperatures of 650 °C for 3 min. It found that the surface recombination velocities of Ga2O3 thin film (3.4 nm and 7.6 nm) decrease to ∼30 cm/s and are saturated with the annealing temperature of 600 °C ∼700 °C. Such results indicate that Ga2O3 thin film show the functions of surface passivation for photovoltaic applications.

  15. Formation and origin of the dominating electron trap in irradiated p-type silicon

    SciTech Connect

    Vines, Lasse; Monakhov, E. V.; Kuznetsov, A. Yu.; Svensson, B. G.

    2008-08-15

    Deep level transient spectroscopy and minority-carrier transient spectroscopy (MCTS) have been applied to study electron-irradiated and proton-irradiated p-type Si samples with boron concentrations in the range of 6x10{sup 13}-2x10{sup 15} cm{sup -3}. Both impurity-lean epitaxially grown samples and Czochralski grown samples have been investigated where some of the epitaxial samples were subjected to oxygenation prior to the irradiation in order to controllably vary the oxygen concentration. The MCTS measurements reveal a dominant electron trap at E{sub c}-0.25 eV, where E{sub c} is the conduction-band edge, commonly ascribed to a boron-interstitial oxygen-interstitial complex (B{sub i}O{sub i}). The amplitude of the level increases linearly with the irradiation dose and it anneals out at {approx}175 deg. C but shows, however, no correlation with the boron concentration. The level is dominant even at doping concentrations in the 10{sup 13} cm{sup -3} range and, irrespective of the oxygen concentration, the generation rate decreases by almost 50% as the boron concentration increases by a factor of {approx}30. Comparison with numerical modeling reveals that these results are not consistent with the commonly accepted model of defect reactions in irradiated p-type Si. Different reasons for this discrepancy are discussed, such as an incomplete defect reaction model and alternative identifications of the E{sub c}-0.25 eV level.

  16. Transformation of divacancies to divacancy-oxygen pairs in p-type Czochralski-silicon; mechanism of divacancy diffusion

    SciTech Connect

    Ganagona, N. Vines, L.; Monakhov, E. V.; Svensson, B. G.

    2014-01-21

    In this work, a comprehensive study on the transition of divacancy (V{sub 2}) to divacancy-oxygen (V{sub 2}O) pairs in p-type silicon has been performed with deep level transient spectroscopy (DLTS). Czochralski grown, boron doped p-type, silicon samples, with a doping concentration of 2 × 10{sup 15} cm{sup −3} and oxygen content of 7.0 ± 1.5 × 10{sup 17} cm{sup −3}, have been irradiated with 1.8 MeV protons. Isothermal annealing at temperatures in the range of 200 °C–300 °C shows a close to one-to-one correlation between the loss in the donor state of V{sub 2} and the formation of the donor state of V{sub 2}O, located at 0.23 eV above the valence band edge. A concurrent transition takes place between the single acceptor states of V{sub 2} and V{sub 2}O, as unveiled by injection of electrons through optical excitation during the trap filling sequence of the DLTS measurements. Applying the theory for diffusion limited reactions, the diffusivity of V{sub 2} in the studied p-type samples is determined to be (1.5 ± 0.7) × 10{sup −3}exp[−(1.31 ± 0.03) eV/kT] cm{sup 2}/s, and this represents the neutral charge state of V{sub 2}. Further, the data seem to favor a two-stage diffusion mechanism involving partial dissociation of V{sub 2}, although a one-stage process cannot be fully excluded.

  17. Low temperature iron gettering by grown-in defects in p-type Czochralski silicon

    NASA Astrophysics Data System (ADS)

    Zhu, Haiyan; Yu, Xuegong; Zhu, Xiaodong; Wu, Yichao; He, Jian; Vanhellemont, Jan; Yang, Deren

    2016-11-01

    Low temperature iron gettering in as-grown boron doped Czochralski silicon (Cz-Si) at temperatures between 220 and 500 °C is studied using microwave-photoconductive decay based minority carrier lifetime measurements. Scanning infrared microscopy technique is used to study the defect density/size distribution in the samples before and after anneal. It is found that the decrease of interstitial iron (Fei) concentration shows a double exponential dependence on annealing time at all temperatures. This suggests the existence of two sinks for Fei. Meanwhile, the observed bulk defect densities and sizes in contaminated and as-grown samples are nearly the same, implying that the grown-in defects could be the gettering centers in this process. The results are important for understanding and controlling low temperature Fei gettering during processing of Cz-Si based devices.

  18. P-stop isolation study of irradiated n-in-p type silicon strip sensors for harsh radiation environments

    NASA Astrophysics Data System (ADS)

    Printz, Martin

    2016-09-01

    In order to determine the most radiation hard silicon sensors for the CMS Experiment after the Phase II Upgrade in 2023 a comprehensive study of silicon sensors after a fluence of up to 1.5 ×1015neq /cm2 corresponding to 3000fb-1 after the HL-LHC era has been carried out. The results led to the decision that the future Outer Tracker (20 cm < R < 110 cm) of CMS will consist of n-in-p type sensors. This technology is more radiation hard but also the manufacturing is more challenging compared to p-in-n type sensors due to additional process steps in order to suppress the accumulation of electrons between the readout strips. One possible isolation technique of adjacent strips is the p-stop structure which is a p-type material implantation with a certain pattern for each individual strip. However, electrical breakdown and charge collection studies indicate that the process parameters of the p-stop structure have to be carefully calibrated in order to achieve a sufficient strip isolation but simultaneously high breakdown voltages. Therefore a study of the isolation characteristics with four different silicon sensor manufacturers has been executed in order to determine the most suitable p-stop parameters for the harsh radiation environment during HL-LHC. Several p-stop doping concentrations, doping depths and different p-stop pattern have been realized and experiments before and after irradiation with protons and neutrons have been performed and compared to T-CAD simulation studies with Synopsys Sentaurus. The measurements combine the electrical characteristics measured with a semi-automatic probestation with Sr90 signal measurements and analogue readout. Furthermore, some samples have been investigated with the help of a cosmic telescope with high resolution allowing charge collection studies of MIPs penetrating the sensor between two strips.

  19. Characterisation of thermal annealed WO x on p-type silicon for hole-selective contacts

    NASA Astrophysics Data System (ADS)

    Lee, Chang-Yeh; Aziz, Mohammad Izzat Abdul; Wenham, Stuart; Hoex, Bram

    2017-08-01

    Carrier-selective contacts have recently gained significant interest in the photovoltaic community. Apart from their minority and majority carrier properties, their thermal stability is also important from an application viewpoint. In this paper, we present a detailed study of the thermal stability of WO x , which is a promising hole-selective contact for silicon wafer solar cells. The film properties are studied after a post deposition annealing in the 200 to 800 °C temperature range. Fourier infrared transmission and X-ray diffraction measurements indicate that WO x films remain amorphous for annealing temperatures below 300 °C. For higher annealing temperatures, the film crystallises and a reduction in oxygen content is observed after 800 °C post deposition annealing. The resistance of the test structure Al/Si(p)/WO x /Al decreases rapidly at 600 °C. A minimum resistance of ∼32 mΩ·cm2 was achieved after annealing at 700 °C. Photoluminescence imaging indicates that the minority carrier recombination significantly increases for annealing temperatures above 600 °C.

  20. Abnormal degradation of high-voltage p-type MOSFET with n+ polycrystalline silicon gate during AC stress

    NASA Astrophysics Data System (ADS)

    Lee, Dongjun; Joo, Ikhyung; Lee, Changsub; Song, Duheon; Choi, Byoungdeog

    2016-11-01

    We investigated the abnormal degradation of high-voltage p-type MOSFET (HV pMOSFET) under negative AC gate bias stress. In HV pMOSFET with n+ polycrystalline silicon (poly-Si) gate, the abnormal degradation occurs after the gradual degradation during negative AC stress. The abnormal degradation is suppressed by changing the gate material from n+ poly-Si to p+ poly-Si, and it is caused by hot holes produced by the impact ionization near the surface when electrons move from the gate toward the gate oxide. We suggest a possible mechanism to explain the improvement of degradation by using p+ poly-Si as a gate material.

  1. Detection of low-level copper contamination in p-type silicon by means of microwave photoconductive decay measurements

    NASA Astrophysics Data System (ADS)

    Yli-Koski, M.; Palokangas, M.; Haarahiltunen, A.; Väinölä, H.; Storgårds, J.; Holmberg, H.; Sinkkonen, J.

    2002-12-01

    In order to achieve a better understanding of the behaviour of copper in p-type silicon, studies of the recombination of copper were carried out by the microwave photoconductive decay measurement method (μ PCD) using high-intensity bias light. It was observed that in the presence of small oxygen precipitates, high-intensity light could be used to activate precipitation of interstitial copper. It is suggested that high-intensity light changes the charge state of interstitial copper from positive to neutral, which enhances the precipitation. The precipitation follows Ham's kinetics and results in an increase in the recombination rate, which is detectable even with very low copper concentrations. This phenomenon can be used to detect low levels of copper contamination by the μ PCD method. In addition, it was observed that out-diffusion as well as in-diffusion of interstitial copper could be affected by an external corona charge. Thus, it is suggested that copper atoms do not form stable bonds at the Si-SiO2 interface after out-diffusion from bulk silicon.

  2. Electron microscopy analysis of crystalline silicon islands formed on screen-printed aluminum-doped p-type silicon surfaces

    SciTech Connect

    Bock, Robert; Schmidt, Jan; Brendel, Rolf

    2008-08-15

    The origin of a not yet understood concentration peak, which is generally measured at the surface of aluminum-doped p{sup +} regions produced in a conventional screen-printing process is investigated. Our findings provide clear experimental evidence that the concentration peak is due to the microscopic structures formed at the silicon surface during the firing process. To characterize the microscopic nature of the islands (lateral dimensions of 1-3 {mu}m) and line networks of self-assembled nanostructures (lateral dimension of {<=}50 nm), transmission electron microscopy, scanning electron microscopy, scanning transmission electron microscopy, and energy dispersive x-ray analysis are combined. Aluminum inclusions are detected 50 nm below the surface of the islands and crystalline aluminum precipitates of {<=}7 nm in diameter are found within the bulk of the islands. In addition, aluminum inclusions (lateral dimension of {approx}30 nm) are found within the bulk of the self-assembled line networks.

  3. Characterization of Ag-porous silicon nanostructured layer formed by an electrochemical etching of p-type silicon surface for bio-application

    NASA Astrophysics Data System (ADS)

    Naddaf, M.; Al-Mariri, A.; Haj-Mhmoud, N.

    2017-06-01

    Nanostructured layers composed of silver-porous silicon (Ag-PS) have been formed by an electrochemical etching of p-type (1 1 1) silicon substrate in a AgNO3:HF:C2H5OH solution at different etching times (10 min-30 min). Scanning electron microscopy (SEM) and energy-dispersive x-ray spectroscopy (EDS) results reveal that the produced layers consist of Ag dendrites and a silicon-rich porous structure. The nanostructuring nature of the layer has been confirmed by spatial micro-Raman scattering and x-ray diffraction techniques. The Ag dendrites exhibit a surface-enhanced Raman scattering (SERS) spectrum, while the porous structure shows a typical PS Raman spectrum. Upon increasing the etching time, the average size of silicon nanocrystallite in the PS network decreases, while the average size of Ag nanocrystals is slightly affected. In addition, the immobilization of prokaryote Salmonella typhimurium DNA via physical adsorption onto the Ag-PS layer has been performed to demonstrate its efficiency as a platform for detection of biological molecules using SERS.

  4. Study of nanoparticles TiO2 thin films on p-type silicon substrate using different alcoholic solvents

    NASA Astrophysics Data System (ADS)

    Muaz, A. K. M.; Hashim, U.; Arshad, M. K. Md.; Ruslinda, A. R.; Ayub, R. M.; Gopinath, Subash C. B.; Voon, C. H.; Liu, Wei-Wen; Foo, K. L.

    2016-07-01

    In this paper, sol-gel method spin coating technique is adopted to prepare nanoparticles titanium dioxide (TiO2) thin films. The prepared TiO2 sol was synthesized using titanium butoxide act as a precursor and subjected to deposited on the p-type silicon oxide (p-SiO2) and glass slide substrates under room temperature. The effect of different alcoholic solvents of methanol and ethanol on the structural, morphological, optical and electrical properties were systematically investigated. The coated TiO2 thin films were annealed in furnace at 773 K for 1 h. The structural properties of the TiO2 films were examined with X-ray Diffraction (XRD). From the XRD analysis, both solvents showing good crystallinity with anatase phase were the predominant structure. Atomic Force Microscopy (AFM) was employed to study the morphological of the thin films. The optical properties were investigated by Ultraviolet-visible (UV-Vis) spectroscopy were found that ethanol as a solvent give a higher optical transmittance if compare to the methanol solvent. The electrical properties of the nanoparticles TiO2 thin films were measured using two-point-probe technique.

  5. Study of nanoparticles TiO{sub 2} thin films on p-type silicon substrate using different alcoholic solvents

    SciTech Connect

    Muaz, A. K. M.; Ruslinda, A. R.; Ayub, R. M.; Gopinath, Subash C. B.; Voon, C. H.; Liu, Wei-Wen; Foo, K. L.; Hashim, U. Arshad, M. K. Md.

    2016-07-06

    In this paper, sol-gel method spin coating technique is adopted to prepare nanoparticles titanium dioxide (TiO{sub 2}) thin films. The prepared TiO{sub 2} sol was synthesized using titanium butoxide act as a precursor and subjected to deposited on the p-type silicon oxide (p-SiO{sub 2}) and glass slide substrates under room temperature. The effect of different alcoholic solvents of methanol and ethanol on the structural, morphological, optical and electrical properties were systematically investigated. The coated TiO{sub 2} thin films were annealed in furnace at 773 K for 1 h. The structural properties of the TiO{sub 2} films were examined with X-ray Diffraction (XRD). From the XRD analysis, both solvents showing good crystallinity with anatase phase were the predominant structure. Atomic Force Microscopy (AFM) was employed to study the morphological of the thin films. The optical properties were investigated by Ultraviolet-visible (UV-Vis) spectroscopy were found that ethanol as a solvent give a higher optical transmittance if compare to the methanol solvent. The electrical properties of the nanoparticles TiO{sub 2} thin films were measured using two-point-probe technique.

  6. Encoding Highly Nonequilibrium Boron Concentrations and Abrupt Morphology in p-Type/n-Type Silicon Nanowire Superlattices.

    PubMed

    Hill, David J; Teitsworth, Taylor S; Kim, Seokhyoung; Christesen, Joseph D; Cahoon, James F

    2017-10-11

    Although silicon (Si) nanowires (NWs) grown by a vapor-liquid-solid (VLS) mechanism have been demonstrated for a range of photonic, electronic, and solar-energy applications, continued progress with these NW-based technologies requires increasingly precise compositional and morphological control of the growth process. However, VLS growth typically encounters problems such as nonselective deposition on sidewalls, inadvertent kinking, unintentional or inhomogeneous doping, and catalyst-induced compositional gradients. Here, we overcome several of these difficulties and report the synthesis of uniform, linear, and degenerately doped Si NW superlattices with abrupt transitions between p-type, intrinsic, and n-type segments. The synthesis of these structures is enabled by in situ chlorination of the NW surface with hydrochloric acid (HCl) at temperatures ranging from 500 to 700 °C, yielding uniform NWs with minimal nonselective growth. Surprisingly, we find the boron (B) doping level in p-type segments to be at least 1 order of magnitude above the solid solubility limit, an effect that we attribute to a high incorporation of B in the liquid catalyst and kinetic trapping of B during crystallization at the liquid-solid interface to yield a highly nonequilibrium concentration. For growth at 510 °C, four-point-probe measurements yield active doping levels of at least 4.5 × 10(19) cm(-3), which is comparable to the phosphorus (P) doping level of n-type segments. Because the B and P dopants are in sufficiently high concentrations for the Si to be degenerately doped, both segments inhibit the etching of Si in aqueous potassium hydroxide (KOH) solution. Moreover, we find that the dopant transitions are abrupt, facilitating nanoscale morphological control in both B- and P-doped segments through selective KOH etching of the NW with a spatial resolution of ∼10 nm. The results presented herein enable the growth of complex, degenerately doped p-n junction nanostructures that

  7. Origin of dislocation luminescence centers and their reorganization in p-type silicon crystal subjected to plastic deformation and high temperature annealing

    NASA Astrophysics Data System (ADS)

    Pavlyk, Bohdan; Kushlyk, Markiyan; Slobodzyan, Dmytro

    2017-05-01

    Changes of the defect structure of silicon p-type crystal surface layer under the influence of plastic deformation and high temperature annealing in oxygen atmosphere were investigated by deep-level capacitance-modulation spectroscopy (DLCMS) and IR spectroscopy of molecules and atom vibrational levels. Special role of dislocations in the surface layer of silicon during the formation of its energy spectrum and rebuilding the defective structure was established. It is shown that the concentration of linear defects ( N ≥ 104 cm-2) enriches surface layer with electrically active complexes (dislocation-oxygen, dislocation-vacancy, and dislocation-interstitial atoms of silicon) which are an effective radiative recombination centers.

  8. Giant piezoresistance of p-type nano-thick silicon induced by interface electron trapping instead of 2D quantum confinement.

    PubMed

    Yang, Yongliang; Li, Xinxin

    2011-01-07

    The p-type silicon giant piezoresistive coefficient is measured in top-down fabricated nano-thickness single-crystalline-silicon strain-gauge resistors with a macro-cantilever bending experiment. For relatively thicker samples, the variation of piezoresistive coefficient in terms of silicon thickness obeys the reported 2D quantum confinement effect. For ultra-thin samples, however, the variation deviates from the quantum-effect prediction but increases the value by at least one order of magnitude (compared to the conventional piezoresistance of bulk silicon) and the value can change its sign (e.g. from positive to negative). A stress-enhanced Si/SiO(2) interface electron-trapping effect model is proposed to explain the 'abnormal' giant piezoresistance that should be originated from the carrier-concentration change effect instead of the conventional equivalent mobility change effect for bulk silicon piezoresistors. An interface state modification experiment gives preliminary proof of our analysis.

  9. Effect of dopant compensation on the temperature dependence of the transport properties in p-type monocrystalline silicon

    SciTech Connect

    Veirman, J.; Martel, B.; Dubois, S.; Stendera, J.

    2014-02-28

    In this paper, we investigate the temperature variations of the hole transport properties in initially uncompensated boron-doped Czochralski silicon progressively compensated through thermal donors activation. After each donor generation anneal, the boron and thermal donor concentrations in the samples are determined using (1) the change in carrier concentration at room temperature and (2) the analysis of the temperature variation of the carrier concentration in the range 77–350 K. By comparing both methods with theory, evidence is brought that down to 77 K the Hall factor is unaffected by compensation up to high compensation levels. This is of great interest for researchers working on new solar-grade materials since it nicely suggests that Hall factor models previously established for non-compensated silicon can be applied to compensated samples, for example, when extracting the individual dopant concentrations from the temperature variations of the hole concentration. At very high compensation levels, anomalous Hall data lead to erroneously low carrier mobility values. We showed that this artifact was due to the formation of a n-p-n transistor, arising from the preferential formation of thermal donors in the sample's subsurface. After rejecting these unphysical data from the analysis, we confirm that the hole mobility is greatly affected by compensation in the temperature range investigated. We eventually confront our experimental data to current mobility models and discuss the possible sources of discrepancy.

  10. Iron-boron pairing kinetics in illuminated p-type and in boron/phosphorus co-doped n-type silicon

    NASA Astrophysics Data System (ADS)

    Möller, Christian; Bartel, Til; Gibaja, Fabien; Lauer, Kevin

    2014-07-01

    Iron-boron (FeB) pairing is observed in the n-type region of a boron and phosphorus co-doped silicon sample which is unexpected from the FeB pair model of Kimerling and Benton. To explain the experimental data, the existing FeB pair model is extended by taking into account the electronic capture and emission rates at the interstitial iron (Fei) trap level as a function of the charge carrier densities. According to this model, the charge state of the Fei may be charged in n-type making FeB association possible. Further, FeB pair formation during illumination in p-type silicon is investigated. This permits the determination of the charge carrier density dependent FeB dissociation rate and in consequence allows to determine the acceptor concentration in the co-doped n-type silicon by lifetime measurement.

  11. Iron-boron pairing kinetics in illuminated p-type and in boron/phosphorus co-doped n-type silicon

    SciTech Connect

    Möller, Christian; Bartel, Til; Gibaja, Fabien; Lauer, Kevin

    2014-07-14

    Iron-boron (FeB) pairing is observed in the n-type region of a boron and phosphorus co-doped silicon sample which is unexpected from the FeB pair model of Kimerling and Benton. To explain the experimental data, the existing FeB pair model is extended by taking into account the electronic capture and emission rates at the interstitial iron (Fe{sub i}) trap level as a function of the charge carrier densities. According to this model, the charge state of the Fe{sub i} may be charged in n-type making FeB association possible. Further, FeB pair formation during illumination in p-type silicon is investigated. This permits the determination of the charge carrier density dependent FeB dissociation rate and in consequence allows to determine the acceptor concentration in the co-doped n-type silicon by lifetime measurement.

  12. Pore size modulation in electrochemically etched macroporous p-type silicon monitored by FFT impedance spectroscopy and Raman scattering.

    PubMed

    Quiroga-González, Enrique; Carstensen, Jürgen; Glynn, Colm; O'Dwyer, Colm; Föll, Helmut

    2014-01-07

    The understanding of the mechanisms of macropore formation in p-type Si with respect to modulation of the pore diameter is still in its infancy. In the present work, macropores with significantly modulated diameters have been produced electrochemically in p-type Si. The effect of the current density and the amount of surfactant in the etching solution are shown to influence the modulation in pore diameter and morphology. Data obtained during the etching process by in situ FFT impedance spectroscopy correlate the pore diameter variation with certain time constants found in the kinetics of the dissolution process. Raman scattering and electron microscopy confirm the mesoscopic structure and roughening of the pore walls. Spectroscopic and microscopic methods confirm that the pore wall morphology is correlated with the conditions of pore modulation.

  13. Interface modification effect between p-type a-SiC:H and ZnO:Al in p-i-n amorphous silicon solar cells.

    PubMed

    Baek, Seungsin; Lee, Jeong Chul; Lee, Youn-Jung; Iftiquar, Sk Md; Kim, Youngkuk; Park, Jinjoo; Yi, Junsin

    2012-01-18

    Aluminum-doped zinc oxide (ZnO:Al) [AZO] is a good candidate to be used as a transparent conducting oxide [TCO]. For solar cells having a hydrogenated amorphous silicon carbide [a-SiC:H] or hydrogenated amorphous silicon [a-Si:H] window layer, the use of the AZO as TCO results in a deterioration of fill factor [FF], so fluorine-doped tin oxide (Sn02:F) [FTO] is usually preferred as a TCO. In this study, interface engineering is carried out at the AZO and p-type a-SiC:H interface to obtain a better solar cell performance without loss in the FF. The abrupt potential barrier at the interface of AZO and p-type a-SiC:H is made gradual by inserting a buffer layer. A few-nanometer-thick nanocrystalline silicon buffer layer between the AZO and a-SiC:H enhances the FF from 67% to 73% and the efficiency from 7.30% to 8.18%. Further improvements in the solar cell performance are expected through optimization of cell structures and doping levels.

  14. Interface modification effect between p-type a-SiC:H and ZnO:Al in p-i-n amorphous silicon solar cells

    PubMed Central

    2012-01-01

    Aluminum-doped zinc oxide (ZnO:Al) [AZO] is a good candidate to be used as a transparent conducting oxide [TCO]. For solar cells having a hydrogenated amorphous silicon carbide [a-SiC:H] or hydrogenated amorphous silicon [a-Si:H] window layer, the use of the AZO as TCO results in a deterioration of fill factor [FF], so fluorine-doped tin oxide (Sn02:F) [FTO] is usually preferred as a TCO. In this study, interface engineering is carried out at the AZO and p-type a-SiC:H interface to obtain a better solar cell performance without loss in the FF. The abrupt potential barrier at the interface of AZO and p-type a-SiC:H is made gradual by inserting a buffer layer. A few-nanometer-thick nanocrystalline silicon buffer layer between the AZO and a-SiC:H enhances the FF from 67% to 73% and the efficiency from 7.30% to 8.18%. Further improvements in the solar cell performance are expected through optimization of cell structures and doping levels. PMID:22257671

  15. Development of Edgeless Silicon Pixel Sensors on p-type substrate for the ATLAS High-Luminosity Upgrade

    NASA Astrophysics Data System (ADS)

    Calderini, G.; Bagolini, A.; Beccherle, R.; Bomben, M.; Boscardin, M.; Bosisio, L.; Chauveau, J.; Giacomini, G.; La Rosa, A.; Marchiori, G.; Zorzi, N.

    2016-09-01

    In view of the LHC upgrade phases towards the High Luminosity LHC (HL-LHC), the ATLAS experiment plans to upgrade the Inner Detector with an all-silicon system. The n-on-p silicon technology is a promising candidate to achieve a large area instrumented with pixel sensors, since it is radiation hard and cost effective. The presentation describes the performance of novel n-in-p edgeless planar pixel sensors produced by FBK-CMM, making use of the active trench for the reduction of the dead area at the periphery of the device. After discussing the sensor technology, some feedback from preliminary results of the first beam test will be discussed.

  16. Inorganic Nano Light-Emitting Transistor: p-Type Porous Silicon Nanowire/n-Type ZnO Nanofilm.

    PubMed

    Lee, Sang Hoon; Kim, Jong Woo; Lee, Tae Il; Myoung, Jae Min

    2016-08-01

    An inorganic nano light-emitting transistor (INLET) consisting of p-type porous Si nanowires (PoSiNWs) and an n-type ZnO nanofilm was integrated on a heavily doped p-type Si substrate with a thermally grown SiO2 layer. To verify that modulation of the Fermi level of the PoSiNWs is key for switchable light emitting, I-V and electroluminescent characteristics of the INLET are investigated as a function of gate bias (V g ). As the V g is changed from 0 V to -20 V, the current level and light-emission intensity in the orange-red range increase by three and two times, respectively, with a forward bias of 20 V in the p-n junction, compared to those at a V g of 0 V. On the other hand, as the V g approaches 10 V, the current level decreases and the emission intensity is reduced and then finally switched off. This result arises from the modulation of the Fermi level of the PoSiNWs and the built-in potential at the p-n junction by the applied gate electric field.

  17. Photoelectron yield spectroscopy and inverse photoemission spectroscopy evaluations of p-type amorphous silicon carbide films prepared using liquid materials

    SciTech Connect

    Murakami, Tatsuya E-mail: mtakashi@jaist.ac.jp; Masuda, Takashi E-mail: mtakashi@jaist.ac.jp; Inoue, Satoshi; Shimoda, Tatsuya; Yano, Hiroshi; Iwamuro, Noriyuki

    2016-05-15

    Phosphorus-doped amorphous silicon carbide films were prepared using a polymeric precursor solution. Unlike conventional polymeric precursors, this polymer requires neither catalysts nor oxidation for its synthesis and cross-linkage, providing semiconducting properties in the films. The valence and conduction states of resultant films were determined directly through the combination of inverse photoemission spectroscopy and photoelectron yield spectroscopy. The incorporated carbon widened energy gap and optical gap comparably in the films with lower carbon concentrations. In contrast, a large deviation between the energy gap and the optical gap was observed at higher carbon contents because of exponential widening of the band tail.

  18. Design and analysis of nanowire p-type MOSFET coaxially having silicon core and germanium peripheral channel

    NASA Astrophysics Data System (ADS)

    Yu, Eunseon; Cho, Seongjae

    2016-11-01

    In this work, a nanowire p-type metal-oxide-semiconductor field-effect transistor (PMOSFET) coaxially having a Si core and a Ge peripheral channel is designed and characterized by device simulations. Owing to the high hole mobility of Ge, the device can be utilized for high-speed CMOS integrated circuits, with the effective confinement of mobile holes in Ge by the large valence band offset between Si and Ge. Source/drain doping concentrations and the ratio between the Si core and Ge channel thicknesses are determined. On the basis of the design results, the channel length is aggressively scaled down by evaluating the primary DC parameters in order to confirm device scalability and low-power applicability in sub-10-nm technology nodes.

  19. Rectification properties of n-type nanocrystalline diamond heterojunctions to p-type silicon carbide at high temperatures

    SciTech Connect

    Goto, Masaki; Amano, Ryo; Shimoda, Naotaka; Kato, Yoshimine; Teii, Kungen

    2014-04-14

    Highly rectifying heterojunctions of n-type nanocrystalline diamond (NCD) films to p-type 4H-SiC substrates are fabricated to develop p-n junction diodes operable at high temperatures. In reverse bias condition, a potential barrier for holes at the interface prevents the injection of reverse leakage current from the NCD into the SiC and achieves the high rectification ratios of the order of 10{sup 7} at room temperature and 10{sup 4} even at 570 K. The mechanism of the forward current injection is described with the upward shift of the defect energy levels in the NCD to the conduction band of the SiC by forward biasing. The forward current shows different behavior from typical SiC Schottky diodes at high temperatures.

  20. Electrical properties and surface morphology of electron beam evaporated p-type silicon thin films on polyethylene terephthalate for solar cells applications

    SciTech Connect

    Ang, P. C.; Ibrahim, K.; Pakhuruddin, M. Z.

    2015-04-24

    One way to realize low-cost thin film silicon (Si) solar cells fabrication is by depositing the films with high-deposition rate and manufacturing-compatible electron beam (e-beam) evaporation onto inexpensive foreign substrates such as glass or plastic. Most of the ongoing research is reported on e-beam evaporation of Si films on glass substrates to make polycrystalline solar cells but works combining both e-beam evaporation and plastic substrates are still scarce in the literature. This paper studies electrical properties and surface morphology of 1 µm electron beam evaporated Al-doped p-type silicon thin films on textured polyethylene terephthalate (PET) substrate for application as an absorber layer in solar cells. In this work, Si thin films with different doping concentrations (including an undoped reference) are prepared by e-beam evaporation. Energy dispersion X-ray (EDX) showed that the Si films are uniformly doped by Al dopant atoms. With increased Al/Si ratio, doping concentration increased while both resistivity and carrier mobility of the films showed opposite relationships. Root mean square (RMS) surface roughness increased. Overall, the Al-doped Si film with Al/Si ratio of 2% (doping concentration = 1.57×10{sup 16} atoms/cm{sup 3}) has been found to provide the optimum properties of a p-type absorber layer for fabrication of thin film Si solar cells on PET substrate.

  1. Direct ultrasensitive electrical detection of prostate cancer biomarkers with CMOS-compatible n- and p-type silicon nanowire sensor arrays

    NASA Astrophysics Data System (ADS)

    Gao, Anran; Lu, Na; Dai, Pengfei; Fan, Chunhai; Wang, Yuelin; Li, Tie

    2014-10-01

    Sensitive and quantitative analysis of proteins is central to disease diagnosis, drug screening, and proteomic studies. Here, a label-free, real-time, simultaneous and ultrasensitive prostate-specific antigen (PSA) sensor was developed using CMOS-compatible silicon nanowire field effect transistors (SiNW FET). Highly responsive n- and p-type SiNW arrays were fabricated and integrated on a single chip with a complementary metal oxide semiconductor (CMOS) compatible anisotropic self-stop etching technique which eliminated the need for a hybrid method. The incorporated n- and p-type nanowires revealed complementary electrical response upon PSA binding, providing a unique means of internal control for sensing signal verification. The highly selective, simultaneous and multiplexed detection of PSA marker at attomolar concentrations, a level useful for clinical diagnosis of prostate cancer, was demonstrated. The detection ability was corroborated to be effective by comparing the detection results at different pH values. Furthermore, the real-time measurement was also carried out in a clinically relevant sample of blood serum, indicating the practicable development of rapid, robust, high-performance, and low-cost diagnostic systems.Sensitive and quantitative analysis of proteins is central to disease diagnosis, drug screening, and proteomic studies. Here, a label-free, real-time, simultaneous and ultrasensitive prostate-specific antigen (PSA) sensor was developed using CMOS-compatible silicon nanowire field effect transistors (SiNW FET). Highly responsive n- and p-type SiNW arrays were fabricated and integrated on a single chip with a complementary metal oxide semiconductor (CMOS) compatible anisotropic self-stop etching technique which eliminated the need for a hybrid method. The incorporated n- and p-type nanowires revealed complementary electrical response upon PSA binding, providing a unique means of internal control for sensing signal verification. The highly

  2. Photo-induced electrochemical anodization of p-type silicon: achievement and demonstration of long term surface stability.

    PubMed

    Dhanekar, Saakshi; Islam, S S; Harsh

    2012-06-15

    Surface stability is achieved and demonstrated by porous silicon (PS) fabricated using a wavelength-dependent photo-electrochemical (PEC) anodization technique. During anodization, the photon flux for all wavelengths was kept constant while only the effect of light wavelength on the surface morphology of PS was investigated. PS optical sensors were realized, characterized and tested using a photoluminescence (PL) quenching technique. An aliphatic chain of alcohols (methanol to n-octanol) was detected in the range of 10-200 ppm. Long term surface stability was observed from samples prepared under red (750-620 nm) and green illumination (570-495 nm), where the PL quenching cycles evoke the possibility of using PS for stable sensor device applications. This study provides a route for preparing highly sensitive organic vapour sensors with a precise selection of the fabrication parameters and demonstrating their prolonged performance.

  3. Photo-induced electrochemical anodization of p-type silicon: achievement and demonstration of long term surface stability

    NASA Astrophysics Data System (ADS)

    Dhanekar, Saakshi; Islam, S. S.; Harsh

    2012-06-01

    Surface stability is achieved and demonstrated by porous silicon (PS) fabricated using a wavelength-dependent photo-electrochemical (PEC) anodization technique. During anodization, the photon flux for all wavelengths was kept constant while only the effect of light wavelength on the surface morphology of PS was investigated. PS optical sensors were realized, characterized and tested using a photoluminescence (PL) quenching technique. An aliphatic chain of alcohols (methanol to n-octanol) was detected in the range of 10-200 ppm. Long term surface stability was observed from samples prepared under red (750-620 nm) and green illumination (570-495 nm), where the PL quenching cycles evoke the possibility of using PS for stable sensor device applications. This study provides a route for preparing highly sensitive organic vapour sensors with a precise selection of the fabrication parameters and demonstrating their prolonged performance.

  4. Development of edgeless silicon pixel sensors on p-type substrate for the ATLAS high-luminosity upgrade

    NASA Astrophysics Data System (ADS)

    Calderini, G.; Bagolini, A.; Bomben, M.; Boscardin, M.; Bosisio, L.; Chauveau, J.; Giacomini, G.; La Rosa, A.; Marchiori, G.; Zorzi, N.

    2014-11-01

    In view of the LHC upgrade for the high luminosity phase (HL-LHC), the ATLAS experiment is planning to replace the inner detector with an all-silicon system. The n-in-p bulk technology represents a valid solution for the modules of most of the layers, given the significant radiation hardness of this option and the reduced cost. The large area necessary to instrument the outer layers will demand to tile the sensors, a solution for which the inefficient region at the border of each sensor needs to be reduced to the minimum size. This paper reports on a joint R&D project by the ATLAS LPNHE Paris group and FBK Trento on a novel n-in-p edgeless planar pixel design, based on the deep-trench process available at FBK.

  5. Further evidence for the quantum confined electrochemistry model of the formation mechanism of p - -type porous silicon

    NASA Astrophysics Data System (ADS)

    Jia, L.; Zang, S. L.; Wong, S. P.; Wilson, I. H.; Hark, S. K.; Liu, Z. F.; Cai, S. M.

    1996-11-01

    Two types of p- porous silicon (PS) were formed in HF solutions of different concentrations. One type with nanoscale (NS) dimensions of about 3 nm and the other with dimensions of about 5 nm. PS samples formed in the lower concentration of HF were anodized again in the higher concentration of HF and vice versa. The photoluminescence peak position and, thus, the size of NS units of PS were found to be related to the concentration of HF in which the PS is formed, independent of the forming time. The larger NS units of PS can be further electrochemically etched by anodization, while the smaller ones cannot. These results give a confirming evidence for the quantum confined electrochemistry model of the formation mechanism of PS based on the quantum confinement effect and classical electrochemical theory [S. L. Zhang, K. S. Ho, Y. T. Hou, B. D. Qian, P. Diao, and S. M. Cai, Appl. Phys. Lett. 62, 642 (1993)].

  6. The electrical properties of photodiodes based on nanostructure gallium doped cadmium oxide/p-type silicon junctions

    NASA Astrophysics Data System (ADS)

    Çavaş, M.; Yakuphanoğlu, F.; Karataş, Ş.

    2017-01-01

    Gallium doped cadmium-oxide (CdO: Ga) thin films were successfully deposited by sol-gel spin coating method on p-type Si substrate. The electrical properties of the photodiode based on nanostructure Ga doped n-CdO/p-Si junctions were investigated. The current-voltage (I-V) characteristics of the structure were investigated under various light intensity and dark. It was observed that generated photocurrent of the Au/n-CdO/p-Si junctions depended on light intensity. The capacitance-voltage and conductance-voltage measurements were carried out for this diode in the frequency range between 100 and 1000 kHz at room temperature by steps of 100 kHz. The capacitance decreased with increasing frequency due to a continuous distribution of the interface states. These results suggested that the Au/n-CdO/p-Si Schottky junctions could be utilized as a photosensor. Furthermore, the voltage and frequency dependence of series resistance were calculated from the C-V and G/ω-V measurements and plotted as functions of voltage and frequency. The distribution profile of R S -V gave a peak in the depletion region at low frequencies and disappeared with increasing frequencies.

  7. The electrical properties of photodiodes based on nanostructure gallium doped cadmium oxide/ p-type silicon junctions

    NASA Astrophysics Data System (ADS)

    Çavaş, M.; Yakuphanoğlu, F.; Karataş, Ş.

    2017-04-01

    Gallium doped cadmium-oxide (CdO: Ga) thin films were successfully deposited by sol-gel spin coating method on p-type Si substrate. The electrical properties of the photodiode based on nanostructure Ga doped n-CdO/ p-Si junctions were investigated. The current-voltage ( I- V) characteristics of the structure were investigated under various light intensity and dark. It was observed that generated photocurrent of the Au/ n-CdO/p-Si junctions depended on light intensity. The capacitance-voltage and conductance-voltage measurements were carried out for this diode in the frequency range between 100 and 1000 kHz at room temperature by steps of 100 kHz. The capacitance decreased with increasing frequency due to a continuous distribution of the interface states. These results suggested that the Au/ n-CdO/ p-Si Schottky junctions could be utilized as a photosensor. Furthermore, the voltage and frequency dependence of series resistance were calculated from the C- V and G/ω-V measurements and plotted as functions of voltage and frequency. The distribution profile of R S - V gave a peak in the depletion region at low frequencies and disappeared with increasing frequencies.

  8. Sub-band transport mechanism and switching properties for resistive switching nonvolatile memories with structure of silver/aluminum oxide/p-type silicon

    SciTech Connect

    Liu, Yanhong; Li, La; Wang, Song; Gao, Ping; Pan, Lujun; Zhang, Jialiang; Zhou, Peng; Li, Jinhua; Weng, Zhankun

    2015-02-09

    In this paper, we discuss a model of sub-band in resistive switching nonvolatile memories with a structure of silver/aluminum oxide/p-type silicon (Ag/Al{sub x}O{sub y}/p-Si), in which the sub-band is formed by overlapping of wave functions of electron-occupied oxygen vacancies in Al{sub x}O{sub y} layer deposited by atomic layer deposition technology. The switching processes exhibit the characteristics of the bipolarity, discreteness, and no need of forming process, all of which are discussed deeply based on the model of sub-band. The relationships between the SET voltages and distribution of trap levels are analyzed qualitatively. The semiconductor-like behaviors of ON-state resistance affirm the sub-band transport mechanism instead of the metal filament mechanism.

  9. Modeling of light-induced degradation due to Cu precipitation in p-type silicon. II. Comparison of simulations and experiments

    NASA Astrophysics Data System (ADS)

    Vahlman, H.; Haarahiltunen, A.; Kwapil, W.; Schön, J.; Inglese, A.; Savin, H.

    2017-05-01

    The presence of copper impurities is known to deteriorate the bulk minority carrier lifetime of silicon. In p-type silicon, the degradation occurs only under carrier injection (e.g., illumination), but the reason for this phenomenon called copper-related light-induced degradation (Cu-LID) has long remained uncertain. To clarify the physics of this problem, a mathematical model of Cu-LID was introduced in Paper I of this article. Within the model, kinetic precipitation simulations are interlinked with a Schottky junction model for electric behavior of metallic precipitates. As this approach enables simulating precipitation directly at the minority carrier lifetime level, the model is verified in this second part with a direct comparison to the corresponding degradation experiments and literature data. Convincing agreement is found with different doping and Cu concentrations as well as at increased temperature, and in the dark, both simulated degradation and measured degradation are very slow. In addition, modeled final lifetimes after illumination are very close to experimental final lifetimes, and a correlation with the final precipitate size is found. However, the model underestimates experimentally observed differences in the degradation rate at different illumination intensities. Nevertheless, the results of this work support the theory of Cu-LID as a precipitate formation process. Part of the results also imply that heterogeneous nucleation sites play a role during precipitate nucleation. The model reveals fundamental aspects of the physics of Cu-LID including how doping and heterogeneous nucleation site concentrations can considerably influence the final recombination activity.

  10. The performance of Y2O3 as interface layer between La2O3 and p-type silicon substrate

    NASA Astrophysics Data System (ADS)

    Wang, Shulong; Chen, Yuhai; Liu, Hongxia; Zhang, Hailin

    2016-11-01

    In this study, the performance of Y2O3 as interface layer between La2O3 and p-type silicon substrate is studied with the help of atomic layer deposition (ALD) and magnetron sputtering technology. The surface morphology of the bilayer films with different structures are observed after rapid thermal annealing (RTA) by atomic force microscopy (AFM). The results show that Y2O3/Al2O3/Si structure has a larger number of small spikes on the surface and its surface roughness is worse than Al2O3/Y2O3/Si structure. The reason is that the density of Si substrate surface is much higher than that of ALD growth Al2O3. With the help of high-frequency capacitance-voltage(C-V) measurement and conductivity method, the density of interface traps can be calculated. After a high temperature annealing, the metal silicate will generate at the substrate interface and result in silicon dangling bond and interface trap charge, which has been improved by X-ray photoelectron spectroscopy (XPS) and interface trap charge density calculation. The interface trapped charge density of La2O3/Al2O3/Si stacked gate structure is lower than that of La2O3/Y2O3/Si gate structure. If Y2O3 is used to replace Al2O3 as the interfacial layer, the accumulation capacitance will increase obviously, which means lower equivalent oxide thickness (EOT). Our results show that interface layer Y2O3 grown by magnetron sputtering can effectively ensure the interface traps near the substrate at relative small level while maintain a relative higher dielectric constant than Al2O3.

  11. A novel technique based on a plasma focus device for nano-porous gallium nitride formation on P-type silicon

    NASA Astrophysics Data System (ADS)

    Sharifi Malvajerdi, S.; Salar Elahi, A.; Habibi, M.

    2017-04-01

    A new deposition formation was observed with a Mather-type Plasma Focus Device (MPFD). MPFD was unitized to fabricate porous Gallium Nitride (GaN) on p-type Silicon (Si) substrate with a (100) crystal orientation for the first time in a deposition process. GaN was deposited on Si with 4 and 7 shots. The samples were subjected to a 3 phase annealing procedure. First, the semiconductors were annealed in the PFD with nitrogen plasma shots after their deposition. Second, a thermal chemical vapor deposition annealed the samples for 1 h at 1050 °C by nitrogen gas at a pressure of 1 Pa. Finally, an electric furnace annealed the samples for 1 h at 1150 °C with continuous flow of nitrogen. Porous GaN structures were observed by Field emission scanning electron microscopy and atomic force microscopy. Furthermore, X-Ray diffraction analysis was carried out to determine the crystallinity of GaN after the samples were annealed. Energy-Dispersive X-Ray Spectroscopy indicated the amount of gallium, nitrogen, and oxygen due to the self-oxidation of the samples. Photoluminescence spectroscopy revealed emissions at 2.94 eV and 3.39 eV, which shows that hexagonal wurtzite crystal structures were formed.

  12. Impact of mechanical stress on gate tunneling currents of germanium and silicon p-type metal-oxide-semiconductor field-effect transistors and metal gate work function

    NASA Astrophysics Data System (ADS)

    Choi, Youn Sung; Numata, Toshinori; Nishida, Toshikazu; Harris, Rusty; Thompson, Scott E.

    2008-03-01

    Uniaxial four-point wafer bending stress-altered gate tunneling currents are measured for germanium (Ge)/silicon (Si) channel metal-oxide-semiconductor field-effect transistors (MOSFETs) with HfO2/SiO2 gate dielectrics and TiN/P+ poly Si electrodes. Carrier separation is used to measure electron and hole currents. The strain-altered hole tunneling current from the p-type inversion layer of Ge is measured to be ˜4 times larger than that for the Si channel MOSFET, since the larger strain-induced valence band-edge splitting in Ge results in more hole repopulation into a subband with a smaller out-of-plane effective mass and a lower tunneling barrier height. The strain-altered electron tunneling current from the metal gate is measured and shown to change due to strain altering the metal work function as quantified by flatband voltage shift measurements of Si MOS capacitors with TaN electrodes.

  13. Effect of Rapid Thermal Processing on Light-Induced Degradation of Carrier Lifetime in Czochralski p-Type Silicon Bare Wafers

    NASA Astrophysics Data System (ADS)

    Kouhlane, Y.; Bouhafs, D.; Khelifati, N.; Belhousse, S.; Menari, H.; Guenda, A.; Khelfane, A.

    2016-11-01

    The electrical properties of Czochralski silicon (Cz-Si) p-type boron-doped bare wafers have been investigated after rapid thermal processing (RTP) with different peak temperatures. Treated wafers were exposed to light for various illumination times, and the effective carrier lifetime ( τ eff) measured using the quasi-steady-state photoconductance (QSSPC) technique. τ eff values dropped after prolonged illumination exposure due to light-induced degradation (LID) related to electrical activation of boron-oxygen (BO) complexes, except in the sample treated with peak temperature of 785°C, for which the τ eff degradation was less pronounced. Also, a reduction was observed when using the 830°C peak temperature, an effect that was enhanced by alteration of the wafer morphology (roughness). Furthermore, the electrical resistivity presented good stability under light exposure as a function of temperature compared with reference wafers. Additionally, the optical absorption edge shifted to higher wavelength, leading to increased free-carrier absorption by treated wafers. Moreover, a theoretical model is used to understand the lifetime degradation and regeneration behavior as a function of illumination time. We conclude that RTP plays an important role in carrier lifetime regeneration for Cz-Si wafers via modification of optoelectronic and structural properties. The balance between an optimized RTP cycle and the rest of the solar cell elaboration process can overcome the negative effect of LID and contribute to achievement of higher solar cell efficiency and module performance.

  14. Silicon mitigates heavy metal stress by regulating P-type heavy metal ATPases, Oryza sativa low silicon genes, and endogenous phytohormones.

    PubMed

    Kim, Yoon-Ha; Khan, Abdul Latif; Kim, Duk-Hwan; Lee, Seung-Yeol; Kim, Kyung-Min; Waqas, Muhammad; Jung, Hee-Young; Shin, Jae-Ho; Kim, Jong-Guk; Lee, In-Jung

    2014-01-09

    Silicon (Si) application has been known to enhance the tolerance of plants against abiotic stresses. However, the protective mechanism of Si under heavy metals contamination is poorly understood. The aim of this study was to assess the role of Si in counteracting toxicity due to cadmium (Cd) and copper (Cu) in rice plants (Oryza sativa). Si significantly improved the growth and biomass of rice plants and reduced the toxic effects of Cd/Cu after different stress periods. Si treatment ameliorated root function and structure compared with non-treated rice plants, which suffered severe root damage. In the presence of Si, the Cd/Cu concentration was significantly lower in rice plants, and there was also a reduction in lipid peroxidation and fatty acid desaturation in plant tissues. The reduced uptake of metals in the roots modulated the signaling of phytohormones involved in responses to stress and host defense, such as abscisic acid, jasmonic acid, and salicylic acid. Furthermore, the low concentration of metals significantly down regulated the mRNA expression of enzymes encoding heavy metal transporters (OsHMA2 and OsHMA3) in Si-metal-treated rice plants. Genes responsible for Si transport (OsLSi1 and OsLSi2), showed a significant up-regulation of mRNA expression with Si treatment in rice plants. The present study supports the active role of Si in the regulation of stresses from heavy metal exposure through changes in root morphology.

  15. Silicon mitigates heavy metal stress by regulating P-type heavy metal ATPases, Oryza sativa low silicon genes, and endogenous phytohormones

    PubMed Central

    2014-01-01

    Background Silicon (Si) application has been known to enhance the tolerance of plants against abiotic stresses. However, the protective mechanism of Si under heavy metals contamination is poorly understood. The aim of this study was to assess the role of Si in counteracting toxicity due to cadmium (Cd) and copper (Cu) in rice plants (Oryza sativa). Results Si significantly improved the growth and biomass of rice plants and reduced the toxic effects of Cd/Cu after different stress periods. Si treatment ameliorated root function and structure compared with non-treated rice plants, which suffered severe root damage. In the presence of Si, the Cd/Cu concentration was significantly lower in rice plants, and there was also a reduction in lipid peroxidation and fatty acid desaturation in plant tissues. The reduced uptake of metals in the roots modulated the signaling of phytohormones involved in responses to stress and host defense, such as abscisic acid, jasmonic acid, and salicylic acid. Furthermore, the low concentration of metals significantly down regulated the mRNA expression of enzymes encoding heavy metal transporters (OsHMA2 and OsHMA3) in Si-metal-treated rice plants. Genes responsible for Si transport (OsLSi1 and OsLSi2), showed a significant up-regulation of mRNA expression with Si treatment in rice plants. Conclusion The present study supports the active role of Si in the regulation of stresses from heavy metal exposure through changes in root morphology. PMID:24405887

  16. Fabrication and characterization of n-type aluminum-boron co-doped ZnO on p-type silicon (n-AZB/p-Si) heterojunction diodes

    SciTech Connect

    Kumar, Vinod; Singh, Neetu; Kapoor, Avinashi; Ntwaeaborwa, Odireleng M.; Swart, Hendrik C.

    2013-11-15

    Graphical abstract: - Highlights: • n-AZB/p-Si heterojunction diodes were formed. • n-AZB/p-Si diode annealed at 700 °C showed best rectifying behavior. • Zn{sub 2}SiO{sub 4} was formed at 800 °C. • n and ϕ{sub b} were estimated to be 1.63 and 0.4 eV, respectively, at 700 °C. • Tailoring of BG was attributed to annealing induced stresses in the films. - Abstract: In this paper, the growth of n-type aluminum boron co-doped ZnO (n-AZB) on a p-type silicon (p-Si) substrate by sol–gel method using spin coating technique is reported. The n-AZB/p-Si heterojunctions were annealed at different temperatures ranging from 400 to 800 °C. The crystallite size of the AZB nanostructures was found to vary from 28 to 38 nm with the variation in annealing temperature. The band gap of the AZB decreased from 3.29 to 3.27 eV, with increasing annealing temperature from 400 to 700 °C and increased to 3.30 eV at 800 °C probably due to the formation of Zn{sub 2}SiO{sub 4} at the interface. The band gap variation is explained in terms of annealing induced stress in the AZB. The n-AZB/p-Si heterojunction exhibited diode behavior. The best rectifying behavior was exhibited at 700 °C.

  17. Pore formation in a p-type silicon wafer using a platinum needle electrode with application of square-wave potential pulses in HF solution.

    PubMed

    Sugita, Tomohiko; Hiramatsu, Kazuki; Ikeda, Shigeru; Matsumura, Michio

    2013-02-01

    By bringing an anodically biased needle electrode into contact with n-type Si at its tip in a solution containing hydrofluoric acid, Si is etched at the interface with the needle electrode and a pore is formed. However, in the case of p-type Si, although pores can be formed, Si is likely to be corroded and covered with a microporous Si layer. This is due to injection of holes from the needle electrode into the bulk of p-type Si, which shifts its potential to a level more positive than the potential needed for corrosion and formation of a microporous Si layer. However, by applying square-wave potential pulses to a Pt needle electrode, these undesirable changes are prevented because holes injected into the bulk of Si during the period of anodic potential are annihilated with electrons injected into Si during the period of cathodic potential. Even under such conditions, holes supplied to the place near the Si/metal interface are used for etching p-type Si, leading to formation of a pore at the place where the Pt needle electrode was in contact.

  18. Recombination activity of light-activated copper defects in p-type silicon studied by injection- and temperature-dependent lifetime spectroscopy

    NASA Astrophysics Data System (ADS)

    Inglese, Alessandro; Lindroos, Jeanette; Vahlman, Henri; Savin, Hele

    2016-09-01

    The presence of copper contamination is known to cause strong light-induced degradation (Cu-LID) in silicon. In this paper, we parametrize the recombination activity of light-activated copper defects in terms of Shockley—Read—Hall recombination statistics through injection- and temperature dependent lifetime spectroscopy (TDLS) performed on deliberately contaminated float zone silicon wafers. We obtain an accurate fit of the experimental data via two non-interacting energy levels, i.e., a deep recombination center featuring an energy level at Ec-Et=0.48 -0.62 eV with a moderate donor-like capture asymmetry ( k =1.7 -2.6 ) and an additional shallow energy state located at Ec-Et=0.1 -0.2 eV , which mostly affects the carrier lifetime only at high-injection conditions. Besides confirming these defect parameters, TDLS measurements also indicate a power-law temperature dependence of the capture cross sections associated with the deep energy state. Eventually, we compare these results with the available literature data, and we find that the formation of copper precipitates is the probable root cause behind Cu-LID.

  19. Temperature Dependent Capacitance-Voltage And Deep Level Transient Spectroscopy Study Of Self-Assembled Ge Quantum Dots Embedded In P-type Silicon

    SciTech Connect

    Rangel-Kuoppa, Victor-Tapio; Chen Gang; Jantsch, Wolfgang

    2011-12-23

    Temperature dependent Capacitance-Voltage (TCV) and Deep Level Transient Spectroscopy (DLTS) techniques were used to study how Ge Quantum Dots (QDs) embedded in Silicon trap charge. Atomic Force Microscopy (AFM) is used to obtain the density of QDs, which is in the order of 3x10{sup 11} cm{sup -2}. Three shallow levels, with activation energies of 40, 65 and 90 meV, and densities around 10{sup 16} cm{sup -3}, are found and are related to Boron. Four deep levels, with activation energies of 110, 150, 330 and 380 meV, and densities between 2x10{sup 15} cm{sup -3} and 5x10{sup 15} cm{sup -3}, are also found. TCV results suggest they are related to the Ge QDs.

  20. Low effective back-surface recombination velocity by boron implantation on 0. 3-. cap omega. -cm p-type silicon solar cells

    SciTech Connect

    Verhoef, L.A.; Zondervan, A.; Lindholm, F.A.; Spitzer, M.B.; Keavney, C.J.

    1988-05-01

    We measure a low effective back-surface recombination velocity Sapprox. =1000 cm/s on boron-implanted back-surface field (BSF) silicon solar cells with a p-base resistivity of 0.3 ..cap omega.. cm. For cells of this low resistivity, this velocity is much lower than values obtained with the conventional Al-alloying technique. Our data indicate that the low surface recombination velocity results from a low value of minority electron diffusivity Dapprox. =0.45 cm/sup 2//s peculiar to these highly doped implanted regions at the back of the solar cells. The effect of a thermal anneal at 950 /sup 0/C, prior to emitter fabrication, on the solar cell parameters was also investigated. The short-circuit current density, minority-carrier diffusion length, and back-surface recombination velocity, improved with a 1- and 2-h anneal of the BSF cells, and either degraded or remained unchanged on ohmic back contact cells. The decrease in S is due to widening of the BSF region during anneal, deduced from spreading resistance measurements.

  1. Impact of the n+ emitter layer on the structural and electrical properties of p-type polycrystalline silicon thin-film solar cells

    NASA Astrophysics Data System (ADS)

    Kumar, A.; Hidayat, H.; Ke, C.; Chakraborty, S.; Dalapati, G. K.; Widenborg, P. I.; Tan, C. C.; Dolmanan, S.; Aberle, A. G.

    2013-10-01

    The effect of the phosphine (PH3) flow rate on the doping profile, in particular the peak doping concentration of the n+ emitter layer, of solid phase crystallised polycrystalline silicon thin-film solar cells on glass is investigated by electrochemical capacitance-voltage profiling. The peak n+ layer doping is found to increase with increasing PH3 gas flow, resulting in a shift of the p-n junction location towards the centre of the diode. The impact of the PH3 flow rate on the crystal quality of the poly-Si films is analysed using ultraviolet (UV) reflectance and UV/visible Raman spectroscopy. The impact of the PH3 flow rate on the efficiency of poly-Si thin-film solar cells is investigated using electrical measurements. An improvement in the efficiency by 46% and a pseudo energy conversion efficiency of 5% was obtained through precise control of the flow rate at an intermediate n+ emitter layer doping concentration of 1.0 × 1019 cm-3. The best fabricated poly-Si thin-film solar cell is also found to have the highest crystal quality factor, based on both Raman and UV reflectance measurements.

  2. Ultralow Contact Resistivity for a Metal/p-Type Silicon Interface by High-Concentration Germanium and Boron Doping Combined with Low-Temperature Annealing

    NASA Astrophysics Data System (ADS)

    Murakoshi, Atsushi; Iwase, Masao; Niiyama, Hiromi; Koike, Mitsuo; Suguro, Kyoichi

    2013-07-01

    A contact resistivity of 6.9×10-9 Ω.cm2 has been obtained in an AlSi (1 wt %)-Cu (0.5 wt %) alloy/silicon system by using heavy-dose ion implantations of germanium and boron combined with low-temperature annealing. The analysis of the combined state showed that B12 cluster was incorporated and the supersaturation activation layer was formed into the region where germanium separated. Separated germanium is expected to have high interface state density. It is considered that this interface state density also has a Fermi level, and in order to reduce the difference from the Fermi level of the substrate, the charge moves to interface state density from the substrate. As a result, it is not based on a metallic material but a work function becomes small because pinning by which a Fermi level is fixed to interface state density occurs owing to the substrate/metal interface. It is considered to be attributable to the existence of a Ge-rich layer formed by low-temperature annealing, and a supersaturation activation layer that lowers contact resistance was formed.

  3. Initial experience with the CDF layer 00 silicon detector

    SciTech Connect

    C. Hill

    2003-03-17

    We report on initial experience with the CDF Layer 00 Detector. Layer 00 is an innovative, low-mass, silicon detector installed in CDF during the upgrade for Run 2A of the Tevatron. Noise pickup present during operation at CDF is discussed. An event-by-event pedestal correction implemented by CDF is presented. This off-line solution prevents L00 from being used in the current incarnation of the on-line displaced track trigger. Preliminary performance of Layer 00 is described.

  4. Low Temperature Deposition and Characterization of N- and P-Type Silicon Carbide Thin Films and Associated Ohmic and Schottky Contacts

    DTIC Science & Technology

    1993-12-01

    1bW Itscf .duaa fla bauem 1 W0 ad fgm i*amAr SeNius. Cheasa.tO If oft WaNblma uiamUw RM I 1215 JuiWgoe Davi ~aa 64 " 1204 I. MPia". VA =10-4=0 &W a...molecular beam epitaxy, X-ray photoelectron spectroscopy, W6 PRICE CODE Auger spectroscopy, transmission electron microscopy11 17. SECURITY CLASSIFICATION...Growth of the 3C and 61H Polytypes of SiC by 12 Gas-source Molecular Beam Epiutaxy IV. Initial Stage of AIN Film Growth on 6H-SiC by Plasma-Assisted

  5. Crystalline Silicon Short-Circuit Current Degradation Study: Initial Results

    SciTech Connect

    Osterwald, C. R.; Pruett, J.; Moriarty, T.

    2005-02-01

    Following our observation of slow degradation of short-circuit current (Isc) in crystalline silicon (x-Si) modules that was correlated with ultraviolet (UV) exposure dose, we initiated a new study of individual x-Si cells designed to determine the degradation cause. In this paper, we report the initial results of this study, which has accumulated 1056 MJ/m2 of UV dose from 1-sun metal-halide irradiance, equivalent to 3.8 years at our test site. At this time, the control samples are unchanged, the unencapsulated samples have lost about 2% of Isc, and the samples encapsulated in module-style packages have declined from 1% to 3%, depending on the cell technology.

  6. Kinetics of initial lithiation of crystalline silicon electrodes of lithium-ion batteries.

    PubMed

    Pharr, Matt; Zhao, Kejie; Wang, Xinwei; Suo, Zhigang; Vlassak, Joost J

    2012-09-12

    Electrochemical experiments were conducted on {100}, {110}, and {111} silicon wafers to characterize the kinetics of the initial lithiation of crystalline Si electrodes. Under constant current conditions, we observed constant cell potentials for all orientations, indicating the existence of a phase boundary that separates crystalline silicon from the amorphous lithiated phase. For a given potential, the velocity of this boundary was found to be faster for {110} silicon than for the other two orientations. We show that our measurements of varying phase boundary velocities can accurately account for anisotropic morphologies and fracture developed in crystalline silicon nanopillars. We also present a kinetic model by considering the redox reaction at the electrolyte/lithiated silicon interface, diffusion of lithium through the lithiated phase, and the chemical reaction at the lithiated silicon/crystalline silicon interface. From this model, we quantify the rates of the reactions at the interfaces and estimate a lower bound on the diffusivity through the lithiated silicon phase.

  7. Initial Steps of Rubicene Film Growth on Silicon Dioxide.

    PubMed

    Scherwitzl, Boris; Lukesch, Walter; Hirzer, Andreas; Albering, Jörg; Leising, Günther; Resel, Roland; Winkler, Adolf

    2013-02-28

    The film growth of the conjugated organic molecule rubicene on silicon dioxide was studied in detail. Since no structural data of the condensed material were available, we first produced high quality single crystals from solution and determined the crystal structure. This high purity material was used to prepare ultrathin films under ultrahigh vacuum conditions, by physical vapor deposition. Thermal desorption spectroscopy (TDS) was applied to delineate the adsorption and desorption kinetics. It could be shown that the initial sticking coefficient is only 0.2 ± 0.05, but the sticking coefficient increases with increasing coverage. TDS further revealed that first a closed, weakly bound bilayer develops (wetting layer), which dewets after further deposition of rubicene, leading to an island-like layer. These islands are crystalline and exhibit the same structure as the solution grown crystals. The orientation of the crystallites is with the (001) plane parallel to the substrate. A dewetting of the closed bilayer was also observed when the film was exposed to air. Furthermore, Ostwald ripening of the island-like film takes place under ambient conditions, leading to films composed of few, large crystallites. From TDS, we determined the heat of evaporation from the multilayer islands to be 1.47 eV, whereas the desorption energy from the first layer is only 1.25 eV.

  8. Initial Steps of Rubicene Film Growth on Silicon Dioxide

    PubMed Central

    2013-01-01

    The film growth of the conjugated organic molecule rubicene on silicon dioxide was studied in detail. Since no structural data of the condensed material were available, we first produced high quality single crystals from solution and determined the crystal structure. This high purity material was used to prepare ultrathin films under ultrahigh vacuum conditions, by physical vapor deposition. Thermal desorption spectroscopy (TDS) was applied to delineate the adsorption and desorption kinetics. It could be shown that the initial sticking coefficient is only 0.2 ± 0.05, but the sticking coefficient increases with increasing coverage. TDS further revealed that first a closed, weakly bound bilayer develops (wetting layer), which dewets after further deposition of rubicene, leading to an island-like layer. These islands are crystalline and exhibit the same structure as the solution grown crystals. The orientation of the crystallites is with the (001) plane parallel to the substrate. A dewetting of the closed bilayer was also observed when the film was exposed to air. Furthermore, Ostwald ripening of the island-like film takes place under ambient conditions, leading to films composed of few, large crystallites. From TDS, we determined the heat of evaporation from the multilayer islands to be 1.47 eV, whereas the desorption energy from the first layer is only 1.25 eV. PMID:23476720

  9. Comparative study of initial stages of copper immersion deposition on bulk and porous silicon

    NASA Astrophysics Data System (ADS)

    Bandarenka, Hanna; Prischepa, Sergey L.; Fittipaldi, Rosalba; Vecchione, Antonio; Nenzi, Paolo; Balucani, Marco; Bondarenko, Vitaly

    2013-02-01

    Initial stages of Cu immersion deposition in the presence of hydrofluoric acid on bulk and porous silicon were studied. Cu was found to deposit both on bulk and porous silicon as a layer of nanoparticles which grew according to the Volmer-Weber mechanism. It was revealed that at the initial stages of immersion deposition, Cu nanoparticles consisted of crystals with a maximum size of 10 nm and inherited the orientation of the original silicon substrate. Deposited Cu nanoparticles were found to be partially oxidized to Cu2O while CuO was not detected for all samples. In contrast to porous silicon, the crystal orientation of the original silicon substrate significantly affected the sizes, density, and oxidation level of Cu nanoparticles deposited on bulk silicon.

  10. P-type gallium nitride

    DOEpatents

    Rubin, M.; Newman, N.; Fu, T.; Ross, J.; Chan, J.

    1997-08-12

    Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5{times}10{sup 11} /cm{sup 3} and hole mobilities of about 500 cm{sup 2} /V-sec, measured at 250 K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al. 9 figs.

  11. P-type gallium nitride

    SciTech Connect

    Rubin, Michael; Newman, Nathan; Fu, Tracy; Ross, Jennifer; Chan, James

    1997-01-01

    Several methods have been found to make p-type gallium nitride. P-type gallium nitride has long been sought for electronic devices. N-type gallium nitride is readily available. Discovery of p-type gallium nitride and the methods for making it will enable its use in ultraviolet and blue light-emitting diodes and lasers. pGaN will further enable blue photocathode elements to be made. Molecular beam epitaxy on substrates held at the proper temperatures, assisted by a nitrogen beam of the proper energy produced several types of p-type GaN with hole concentrations of about 5.times.10.sup.11 /cm.sup.3 and hole mobilities of about 500 cm.sup.2 /V-sec, measured at 250.degree. K. P-type GaN can be formed of unintentionally-doped material or can be doped with magnesium by diffusion, ion implantation, or co-evaporation. When applicable, the nitrogen can be substituted with other group III elements such as Al.

  12. Plasma-initiated rehydrogenation of amorphous silicon to increase the temperature processing window of silicon heterojunction solar cells

    DOE PAGES

    Shi, Jianwei; Boccard, Mathieu; Holman, Zachary

    2016-07-19

    The dehydrogenation of intrinsic hydrogenated amorphous silicon (a-Si:H) at temperatures above approximately 300°C degrades its ability to passivate silicon wafer surfaces. This limits the temperature of post-passivation processing steps during the fabrication of advanced silicon heterojunction or silicon-based tandem solar cells. We demonstrate that a hydrogen plasma can rehydrogenate intrinsic a-Si:H passivation layers that have been dehydrogenated by annealing. The hydrogen plasma treatment fully restores the effective carrier lifetime to several milliseconds in textured crystalline siliconwafers coated with 8-nm-thick intrinsic a-Si:H layers after annealing at temperatures of up to 450°C. Plasma-initiated rehydrogenation also translates to complete solar cells: A silicon heterojunction solar cell subjected to annealing at 450°C (following intrinsic a-Si:H deposition) had an open-circuit voltage of less than 600 mV, but an identical cell that received hydrogen plasma treatment reached a voltagemore » of over 710 mV and an efficiency of over 19%.« less

  13. Plasma-initiated rehydrogenation of amorphous silicon to increase the temperature processing window of silicon heterojunction solar cells

    SciTech Connect

    Shi, Jianwei; Boccard, Mathieu; Holman, Zachary

    2016-07-19

    The dehydrogenation of intrinsic hydrogenated amorphous silicon (a-Si:H) at temperatures above approximately 300°C degrades its ability to passivate silicon wafer surfaces. This limits the temperature of post-passivation processing steps during the fabrication of advanced silicon heterojunction or silicon-based tandem solar cells. We demonstrate that a hydrogen plasma can rehydrogenate intrinsic a-Si:H passivation layers that have been dehydrogenated by annealing. The hydrogen plasma treatment fully restores the effective carrier lifetime to several milliseconds in textured crystalline siliconwafers coated with 8-nm-thick intrinsic a-Si:H layers after annealing at temperatures of up to 450°C. Plasma-initiated rehydrogenation also translates to complete solar cells: A silicon heterojunction solar cell subjected to annealing at 450°C (following intrinsic a-Si:H deposition) had an open-circuit voltage of less than 600 mV, but an identical cell that received hydrogen plasma treatment reached a voltage of over 710 mV and an efficiency of over 19%.

  14. Initiation time of near-infrared laser-induced slip on the surface of silicon wafers

    SciTech Connect

    Choi, Sungho; Jhang, Kyung-Young

    2014-06-23

    We have determined the initiation time of laser-induced slip on a silicon wafer surface subjected to a near-infrared continuous-wave laser by numerical simulations and experiments. First, numerical analysis was performed based on the heat transfer and thermoelasticity model to calculate the resolved shear stress and the temperature-dependent yield stress. Slip initiation time was predicted by finding the time at which the resolved shear stress reached the yield stress. Experimentally, the slip initiation time was measured by using a laser scattering technique that collects scattered light from the silicon wafer surface and detects strong scattering when the surface slip is initiated. The surface morphology of the silicon wafer surface after laser irradiation was also observed using an optical microscope to confirm the occurrence of slip. The measured slip initiation times agreed well with the numerical predictions.

  15. Initial results for the silicon monolithically interconnected solar cell product

    NASA Technical Reports Server (NTRS)

    Dinetta, L. C.; Shreve, K. P.; Cotter, J. E.; Barnett, A. M.

    1995-01-01

    This proprietary technology is based on AstroPower's electrostatic bonding and innovative silicon solar cell processing techniques. Electrostatic bonding allows silicon wafers to be permanently attached to a thermally matched glass superstrate and then thinned to final thicknesses less than 25 micron. These devices are based on the features of a thin, light-trapping silicon solar cell: high voltage, high current, light weight (high specific power) and high radiation resistance. Monolithic interconnection allows the fabrication costs on a per watt basis to be roughly independent of the array size, power or voltage, therefore, the cost effectiveness to manufacture solar cell arrays with output powers ranging from milliwatts up to four watts and output voltages ranging from 5 to 500 volts will be similar. This compares favorably to conventionally manufactured, commercial solar cell arrays, where handling of small parts is very labor intensive and costly. In this way, a wide variety of product specifications can be met using the same fabrication techniques. Prototype solar cells have demonstrated efficiencies greater than 11%. An open-circuit voltage of 5.4 volts, fill factor of 65%, and short-circuit current density of 28 mA/sq cm at AM1.5 illumination are typical. Future efforts are being directed to optimization of the solar cell operating characteristics as well as production processing. The monolithic approach has a number of inherent advantages, including reduced cost per interconnect and increased reliability of array connections. These features make this proprietary technology an excellent candidate for a large number of consumer products.

  16. Initial results for the silicon monolithically interconnected solar cell product

    NASA Technical Reports Server (NTRS)

    Dinetta, L. C.; Shreve, K. P.; Cotter, J. E.; Barnett, A. M.

    1995-01-01

    This proprietary technology is based on AstroPower's electrostatic bonding and innovative silicon solar cell processing techniques. Electrostatic bonding allows silicon wafers to be permanently attached to a thermally matched glass superstrate and then thinned to final thicknesses less than 25 micron. These devices are based on the features of a thin, light-trapping silicon solar cell: high voltage, high current, light weight (high specific power) and high radiation resistance. Monolithic interconnection allows the fabrication costs on a per watt basis to be roughly independent of the array size, power or voltage, therefore, the cost effectiveness to manufacture solar cell arrays with output powers ranging from milliwatts up to four watts and output voltages ranging from 5 to 500 volts will be similar. This compares favorably to conventionally manufactured, commercial solar cell arrays, where handling of small parts is very labor intensive and costly. In this way, a wide variety of product specifications can be met using the same fabrication techniques. Prototype solar cells have demonstrated efficiencies greater than 11%. An open-circuit voltage of 5.4 volts, fill factor of 65%, and short-circuit current density of 28 mA/sq cm at AM1.5 illumination are typical. Future efforts are being directed to optimization of the solar cell operating characteristics as well as production processing. The monolithic approach has a number of inherent advantages, including reduced cost per interconnect and increased reliability of array connections. These features make this proprietary technology an excellent candidate for a large number of consumer products.

  17. Determination of Initial Crack Strength of Silicon Die Using Acoustic Emission Technique

    NASA Astrophysics Data System (ADS)

    Chen, Pei-Chi; Su, Yen-Fu; Yang, Shin-Yueh; Liang, Steven Y.; Chiang, Kuo-Ning

    2015-07-01

    The current market demand for high-efficiency, high-performance, small-sized electronic products has focused attention on the use of three-dimensional (3D) integrated circuits (IC) in the design of electronic packaging. Silicon wafers can be ground and polished to reduce their thickness and increase the chip stacking density. However, microcracks can result from the thinning and stacking process or during use of an electronic device over time; therefore, estimation of the cracking strength is an important issue in 3D IC packaging. This research combined the ball breaker test (BBT) with an acoustic emission (AE) system to measure the allowable force on a silicon die. To estimate the initial crack strength of a silicon die, the BBT was combined with finite-element (FE) analysis. The AE system can detect the initial crack and the subsequent bulk failure of the silicon die individually, thus avoiding overestimation of the die strength. In addition, the results of the modified ball breaker test showed that edge chipping did not affect the silicon die strength. However, the failure force and silicon die strength were reduced as the surface roughness of the test specimen increased. Thus, surface roughness must be controlled in the BBT to prevent underestimation of the silicon die strength.

  18. An initial in-orbit performance study of Silicon Tungsten tracKer on DAMPE

    NASA Astrophysics Data System (ADS)

    Qiao, Rui

    2016-07-01

    The dark matter particle explorer (DAMPE) was launched in December 2015 and taking data since then. One of its major payloads, Silicon Tungsten tracker (STK) plays an important role in tracking and ion charge identification. From the study of first few months of data collection of STK, the noise behaviors, DAC/MIPs calibration and an initial charge detection result will be presented.

  19. Void initiation from interfacial debonding of spherical silicon particles inside a silicon-copper nanocomposite: a molecular dynamics study

    NASA Astrophysics Data System (ADS)

    Cui, Yi; Chen, Zengtao

    2017-02-01

    Silicon particles with diameters from 1.9 nm to 30 nm are embedded in a face-centered-cubic copper matrix to form nanocomposite specimens for simulation. The interfacial debonding of silicon particles from the copper matrix and the subsequent growth of nucleated voids are studied via molecular dynamics (MD). The MD results are examined from several different perspectives. The overall mechanical performance is monitored by the average stress-strain response and the accumulated porosity. The ‘relatively farthest-traveled’ atoms are identified to characterize the onset of interfacial debonding. The relative displacement field is plotted to illustrate both subsequent interfacial debonding and the growth of a nucleated void facilitated by a dislocation network. Our results indicate that the initiation of interfacial debonding is due to the accumulated surface stress if the matrix is initially dislocation-free. However, pre-existing dislocations can make a considerable difference. In either case, the dislocation emission also contributes to the subsequent debonding process. As for the size effect, the debonding of relatively larger particles causes a drop in the stress-strain curve. The volume fraction of second-phase particles is found to be more influential than the size of the simulation box on the onset of interfacial debonding. The volume fraction of second-phase particles also affects the shape of the nucleated void and, therefore, influences the stress response of the composite.

  20. Surface-initiated hyperbranched polyglycerol as an ultralow-fouling coating on glass, silicon, and porous silicon substrates.

    PubMed

    Moore, Eli; Delalat, Bahman; Vasani, Roshan; McPhee, Gordon; Thissen, Helmut; Voelcker, Nicolas H

    2014-09-10

    Anionic ring-opening polymerization of glycidol was initiated from activated glass, silicon, and porous silicon substrates to yield thin, ultralow-fouling hyperbranched polyglycerol (HPG) graft polymer coatings. Substrates were activated by deprotonation of surface-bound silanol functionalities. HPG polymerization was initiated upon the addition of freshly distilled glycidol to yield films in the nanometer thickness range. X-ray photoelectron spectroscopy, contact angle measurements, and ellipsometry were used to characterize the resulting coatings. The antifouling properties of HPG-coated surfaces were evaluated in terms of protein adsorption and the attachment of mammalian cells. The adsorption of bovine serum albumin and collagen type I was found to be reduced by as much as 97 and 91%, respectively, in comparison to untreated surfaces. Human glioblastoma and mouse fibroblast attachment was reduced by 99 and 98%, respectively. HPG-grafted substrates outperformed polyethylene glycol (PEG) grafted substrates of comparable thickness under the same incubation conditions. Our results demonstrate the effectiveness of antifouling HPG graft polymer coatings on a selected range of substrate materials and open the door for their use in biomedical applications.

  1. Temperature-dependent current-voltage characteristics and ultraviolet light detection of heterojunction diodes comprising n-type ultrananocrystalline diamond/hydrogenated amorphous carbon composite films and p-type silicon substrates

    NASA Astrophysics Data System (ADS)

    Zkria, Abdelrahman; Yoshitake, Tsuyoshi

    2017-07-01

    Heterojunction diodes comprising poorly (1 at. %) nitrogen-doped n-type ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C:H) films and p-type Si substrates were prepared in nitrogen and hydrogen mixed gas atmosphere by coaxial arc plasma deposition. Dark current density-voltage (J-V) characteristics were studied in the temperature range of 200-400 K, in order to investigate the current transport mechanism through the fabricated heterojunctions. The temperature dependence of the ideality factor and reverse saturation current reveals that carrier transport predominantly occurs in the generation-recombination mechanism and, at low temperatures, it accompanies tunneling via weak traps. The heterojunctions surely exhibited photodetection for 254 nm ultraviolet light illumination. It is expected that photocarriers will be generated at UNCD grains and transported through an a-C:H matrix.

  2. Silicon-based bridge wire micro-chip initiators for bismuth oxide-aluminum nanothermite

    NASA Astrophysics Data System (ADS)

    Staley, C. S.; Morris, C. J.; Thiruvengadathan, R.; Apperson, S. J.; Gangopadhyay, K.; Gangopadhyay, S.

    2011-11-01

    We present a micro-manufacturing process for fabricating silicon-based bridge wire micro-chip initiators with the capacity to liberate joules of chemical energy at the expense of micro joules of input electrical energy. The micro-chip initiators are assembled with an open material reservoir utilizing a novel 47 °C melting point solder alloy bonding procedure and integrated with a bismuth oxide-aluminum nanothermite energetic composite. The electro-thermal conversion efficiency of the initiators is enhanced by the use of a nanoporous silicon bed which impedes thermal coupling between the bridge wire and bulk silicon substrate while maintaining the structural integrity of the device. Electrical behaviors of the ignition elements are investigated to extract minimum input power and energy requirements of 382.4 mW and 26.51 µJ, respectively, both in the absence and presence of an injected bismuth oxide-aluminum nanothermite composition. Programmed combustion of bismuth oxide-aluminum nanothermite housed within these initiators is demonstrated with a success rate of 100% over a 30 to 80 µJ range of firing energies and ignition response times of less than 2 µs are achieved in the high input power operation regime. The micro-initiators reported here are intended for use in miniaturized actuation technologies.

  3. Characterization of the initial level and migration of silicone oil lubricant in empty prefilled syringes for biologics using infrared spectroscopy.

    PubMed

    Bee, Jared S; Frey, Vadim V; Javed, Urooj; Chung, Jonathan; Corcoran, Marta L; Roussel, Paul S; Krause, Stephan O; Cash, Patricia W; Bishop, Steven M; Dimitrova, Mariana N

    2014-01-01

    Glass prefillable syringes are lubricated with silicone oil to ensure functionality and a consistent injection for the end user. If excessive silicone is applied, droplets could potentially result in aggregation of sensitive biopharmaceuticals or clouding of the solution. Therefore, monitoring and optimization of the applied silicone layer is critical for prefilled syringe development. The hydrophobic properties of silicone oil, the potential for assay interference, and the very small quantities applied to prefilled syringes present a challenge for the development of a suitable assay. In this work we present a rapid and simple Fourier transform infrared (FTIR) spectroscopy method for quantitation of total silicone levels applied to prefilled syringes. Level-dependent silicone oil migration occurred over time for empty prefilled syringes stored tip-up. However, migration from all prefilled syringes with between 0.25 and 0.8 mg of initial silicone oil resulted in a stable limiting minimum level of between 0.15 and 0.26 mg of silicone in the syringe reached after 1 to 4 years of empty tip-up storage. The results of the FTIR assay correlated well with non-destructive reflectometry characterization of the syringes. This assay can provide valuable data for selection of a robust initial silicone oil target and quality control of prefilled syringes intended for biopharmaceuticals. Glass prefillable syringes are lubricated with silicone oil to ensure functionality and a consistent injection for the end user. If excessive silicone is applied, droplets could potentially result in aggregation of sensitive biopharmaceuticals or clouding of the solution. Therefore, monitoring and optimization of the applied silicone layer is critical for prefilled syringe development. The hydrophobic properties of silicone oil, the potential for assay interference, and the very small quantities applied to prefilled syringes present a challenge for the development of a suitable assay. In this

  4. 3-D patterning of silicon by laser-initiated, liquid-assisted colloidal (LILAC) lithography.

    PubMed

    Ulmeanu, M; Grubb, M P; Jipa, F; Quignon, B; Ashfold, M N R

    2015-06-01

    We report a comprehensive study of laser-initiated, liquid-assisted colloidal (LILAC) lithography, and illustrate its utility in patterning silicon substrates. The method combines single shot laser irradiation (frequency doubled Ti-sapphire laser, 50fs pulse duration, 400nm wavelength) and medium-tuned optical near-field effects around arrays of silica colloidal particles to achieve 3-D surface patterning of silicon. A monolayer (or multilayers) of hexagonal close packed silica colloidal particles act as a mask and offer a route to liquid-tuned optical near field enhancement effects. The resulting patterns are shown to depend on the difference in refractive index of the colloidal particles (ncolloid) and the liquid (nliquid) in which they are immersed. Two different topographies are demonstrated experimentally: (a) arrays of bumps, centred beneath the original colloidal particles, when using liquids with nliquidncolloid - and explained with the aid of complementary Mie scattering simulations. The LILAC lithography technique has potential for rapid, large area, organized 3-D patterning of silicon (and related) substrates. Copyright © 2014 Elsevier Inc. All rights reserved.

  5. Synthesis of Poly-Silicon Thin Films on Glass Substrate Using Laser Initiated Metal Induced Crystallization of Amorphous Silicon for Space Power Application

    NASA Technical Reports Server (NTRS)

    Abu-Safe, Husam H.; Naseem, Hameed A.; Brown, William D.

    2007-01-01

    Poly-silicon thin films on glass substrates are synthesized using laser initiated metal induced crystallization of hydrogenated amorphous silicon films. These films can be used to fabricate solar cells on low cost glass and flexible substrates. The process starts by depositing 200 nm amorphous silicon films on the glass substrates. Following this, 200 nm of sputtered aluminum films were deposited on top of the silicon layers. The samples are irradiated with an argon ion cw laser beam for annealing. Laser power densities ranging from 4 to 9 W/cm2 were used in the annealing process. Each area on the sample is irradiated for a different exposure time. Optical microscopy was used to examine any cracks in the films and loss of adhesion to the substrates. X-Ray diffraction patterns from the initial results indicated the crystallization in the films. Scanning electron microscopy shows dendritic growth. The composition analysis of the crystallized films was conducted using Energy Dispersive x-ray Spectroscopy. The results of poly-silicon films synthesis on space qualified flexible substrates such as Kapton are also presented.

  6. Gradient Poly(styrene-co-polyglycidol) Grafts via Silicon Surface-Initiated AGET ATRP.

    PubMed

    Gosecka, Monika; Pietrasik, Joanna; Decorse, Philippe; Glebocki, Bartosz; Chehimi, Mohamed M; Slomkowski, Stanislaw; Basinska, Teresa

    2015-05-05

    Gradient copolymer grafts of styrene and α-tert-butoxy-ω-vinylbenzyl-poly(glycidol ethoxyethyl ether) (PGLet), a precursor of α-tert-butoxy-ω-vinylbenzyl-polyglycidol macromonomer (PGL), were prepared on silicon wafers via a surface-initiated activator generated by electron transfer radical polymerization (AGET ATRP). Silicon plates with previously attached 2-bromoisobutyrate served as a macroinitiator for the AGET ATRP (activator generated by electron transfer) of styrene and PGLet. The copolymers' gradient P(S-co-PPGL) of composition and thickness was obtained by a simple method where the plates were slowly removed from reaction mixture using a step motor. PGLet was added continuously (dropwise) into the reactor during withdrawal of the plates from solution in order to increase the relative concentration of PGLet in polymerization mixture. A range of strategies of making grafts was tested. The plates with copolymers grafts were analyzed by various techniques, like XPS, ellipsometry, and FTIR spectroscopy. The results indicate that the AGET ATRP process is dependent on the styrene/PGLet macromonomer ratio in the polymerization mixture. Under optimal conditions, the addition of PGLet during polymerization and subsequent deprotection of hydroxyl groups of PGLet permit to obtain plates with a novel copolymer layer with composition, thickness, and wettability gradient. Plates with chemical composition of copolymer grafts gradient served as versatile supports with controlled hydrophilic/hydrophobic area and were suitable for tailored deposition of particles.

  7. Neutron-irradiation creep of silicon carbide materials beyond the initial transient

    NASA Astrophysics Data System (ADS)

    Koyanagi, Takaaki; Katoh, Yutai; Ozawa, Kazumi; Shimoda, Kazuya; Hinoki, Tatsuya; Snead, Lance L.

    2016-09-01

    Irradiation creep beyond the transient regime was investigated for various silicon carbide (SiC) materials. The materials examined included polycrystalline or monocrystalline high-purity SiC, nanopowder sintered SiC, highly crystalline and near-stoichiometric SiC fibers (including Hi-Nicalon Type S, Tyranno SA3, isotopically-controlled Sylramic and Sylramic-iBN fibers), and a Tyranno SA3 fiber-reinforced SiC matrix composite fabricated through a nano-infiltration transient eutectic phase process. Neutron irradiation experiments for bend stress relaxation tests were conducted at irradiation temperatures ranging from 430 to 1180 °C up to 30 dpa with initial bend stresses of up to ∼1 GPa for the fibers and ∼300 MPa for the other materials. Initial bend stress in the specimens continued to decrease from 1 to 30 dpa. Analysis revealed that (1) the stress exponent of irradiation creep above 1 dpa is approximately unity, (2) the stress normalized creep rate is ∼1 × 10-7 [dpa-1 MPa-1] at 430-750 °C for the range of 1-30 dpa for most polycrystalline SiC materials, and (3) the effects on irradiation creep of initial microstructures-such as grain boundary, crystal orientation, and secondary phases-increase with increasing irradiation temperature.

  8. Neutron-irradiation creep of silicon carbide materials beyond the initial transient

    DOE PAGES

    Katoh, Yutai; Ozawa, Kazumi; Shimoda, Kazuya; ...

    2016-06-04

    Irradiation creep beyond the transient regime was investigated for various silicon carbide (SiC) materials. Here, the materials examined included polycrystalline or monocrystalline high-purity SiC, nanopowder sintered SiC, highly crystalline and near-stoichiometric SiC fibers (including Hi-Nicalon Type S, Tyranno SA3, isotopically-controlled Sylramic and Sylramic-iBN fibers), and a Tyranno SA3 fiber–reinforced SiC matrix composite fabricated through a nano-infiltration transient eutectic phase process. Neutron irradiation experiments for bend stress relaxation tests were conducted at irradiation temperatures ranging from 430 to 1180 °C up to 30 dpa with initial bend stresses of up to ~1 GPa for the fibers and ~300 MPa for themore » other materials. Initial bend stress in the specimens continued to decrease from 1 to 30 dpa. Analysis revealed that (1) the stress exponent of irradiation creep above 1 dpa is approximately unity, (2) the stress normalized creep rate is ~1 × 10–7 [dpa–1 MPa–1] at 430–750 °C for the range of 1–30 dpa for most polycrystalline SiC materials, and (3) the effects on irradiation creep of initial microstructures—such as grain boundary, crystal orientation, and secondary phases—increase with increasing irradiation temperature.« less

  9. Neutron-irradiation creep of silicon carbide materials beyond the initial transient

    SciTech Connect

    Katoh, Yutai; Ozawa, Kazumi; Shimoda, Kazuya; Hinoki, Tatsuya; Snead, Lance Lewis; Koyanagi, Takaaki

    2016-06-04

    Irradiation creep beyond the transient regime was investigated for various silicon carbide (SiC) materials. Here, the materials examined included polycrystalline or monocrystalline high-purity SiC, nanopowder sintered SiC, highly crystalline and near-stoichiometric SiC fibers (including Hi-Nicalon Type S, Tyranno SA3, isotopically-controlled Sylramic and Sylramic-iBN fibers), and a Tyranno SA3 fiber–reinforced SiC matrix composite fabricated through a nano-infiltration transient eutectic phase process. Neutron irradiation experiments for bend stress relaxation tests were conducted at irradiation temperatures ranging from 430 to 1180 °C up to 30 dpa with initial bend stresses of up to ~1 GPa for the fibers and ~300 MPa for the other materials. Initial bend stress in the specimens continued to decrease from 1 to 30 dpa. Analysis revealed that (1) the stress exponent of irradiation creep above 1 dpa is approximately unity, (2) the stress normalized creep rate is ~1 × 10–7 [dpa–1 MPa–1] at 430–750 °C for the range of 1–30 dpa for most polycrystalline SiC materials, and (3) the effects on irradiation creep of initial microstructures—such as grain boundary, crystal orientation, and secondary phases—increase with increasing irradiation temperature.

  10. Neutron-irradiation creep of silicon carbide materials beyond the initial transient

    SciTech Connect

    Katoh, Yutai; Ozawa, Kazumi; Shimoda, Kazuya; Hinoki, Tatsuya; Snead, Lance Lewis; Koyanagi, Takaaki

    2016-06-04

    Irradiation creep beyond the transient regime was investigated for various silicon carbide (SiC) materials. Here, the materials examined included polycrystalline or monocrystalline high-purity SiC, nanopowder sintered SiC, highly crystalline and near-stoichiometric SiC fibers (including Hi-Nicalon Type S, Tyranno SA3, isotopically-controlled Sylramic and Sylramic-iBN fibers), and a Tyranno SA3 fiber–reinforced SiC matrix composite fabricated through a nano-infiltration transient eutectic phase process. Neutron irradiation experiments for bend stress relaxation tests were conducted at irradiation temperatures ranging from 430 to 1180 °C up to 30 dpa with initial bend stresses of up to ~1 GPa for the fibers and ~300 MPa for the other materials. Initial bend stress in the specimens continued to decrease from 1 to 30 dpa. Analysis revealed that (1) the stress exponent of irradiation creep above 1 dpa is approximately unity, (2) the stress normalized creep rate is ~1 × 10–7 [dpa–1 MPa–1] at 430–750 °C for the range of 1–30 dpa for most polycrystalline SiC materials, and (3) the effects on irradiation creep of initial microstructures—such as grain boundary, crystal orientation, and secondary phases—increase with increasing irradiation temperature.

  11. Influence of different nucleation layers on the initial grain structure of multicrystalline silicon ingots

    NASA Astrophysics Data System (ADS)

    Kupka, I.; Lehmann, T.; Trempa, M.; Kranert, C.; Reimann, C.; Friedrich, J.

    2017-05-01

    The grain structure of high-performance (HP) multicrystalline silicon (mc-Si) is characterized by a small initial grain size with randomly oriented grains and a high length fraction of random grain boundaries. However, the remaining unmelted feedstock at the ingot bottom used as seeding layer for achieving the HP mc-Si properties in the standard crystallization procedure causes yield loss. To overcome this disadvantage, the influence of wetting angle, and surface roughness of non-Si nucleation layers at the crucible bottom on the grain structure properties of mc-Si ingots with a weight of 14.5 kg was investigated and compared to classical HP mc-Si. For that purpose, SiC and SiO2 nucleation layers realized by spraying and embedding of particles with different sizes resulting in different surface morphologies and wetting angles were studied. Nucleation on rough layers of both materials with a root mean square roughness value greater than 100 μm yielded an initially fine grain structure comparable to HP mc-Si. This did not necessarily result in a random orientation distribution and high length fraction of random grain boundaries. Nucleation on SiC layers caused random grain boundary length fractions between 20 and 30% and non-uniform grain distributions. But, nucleation on SiO2 layers yielded increased random grain boundary length fractions between 50 and 70% and homogenous grain distributions, both values are similar to HP mc-Si. These differences are discussed in terms of the thermal conductivity of the different nucleation layers.

  12. Rethinking the P-type ATPase problem.

    PubMed

    Scarborough, Gene A

    2003-11-01

    There are very good reasons to stop thinking about the molecular mechanism of the P-type ion-translocating ATPases in terms of the traditional E1E2 model and to start thinking about it in more progressive ways. This makes it possible to see the ion-transport cycle as a rational series of discrete steps with well defined driving forces, including the crucial energy transduction step, where the chemical energy of ATP hydrolysis is exchanged for the osmotic energy of an ion gradient. Importantly, although major enzyme conformational changes accompany each of these steps, none of them drive the energy coupling reaction. Thus, neither the E1E2 model nor conformational energy coupling, the cornerstones of traditional thinking about the P-type ATPases, are reliable paradigms for future efforts to understand how these transporters work. Alternatives must be seriously considered.

  13. Three-point bending analysis of doubly clamped silicon nanowire beams; Young's modulus, initial stress, and crystal orientation

    SciTech Connect

    Yaish, Y. E. Calahorra, Y.; Shtempluck, O.; Kotchetkov, V.

    2015-04-28

    A non-linear model is introduced describing the force-deflection relation of doubly clamped beams, including initial stress. Several approximations for the exact model are developed and compared, revealing the importance of considering the initial stress during 3-point bending measurements analysis. A novel approximation is found to be better than others, and both the exact model and this approximation are in perfect agreement with finite element simulations. A brief experimental example of silicon nanowires is presented in which the Young's modulus, the initial stress, and the crystallographic growth orientation are extracted by 3-point bending analysis.

  14. Initial reaction of silicon precursors with a varying number of dimethylamino ligands on a hydroxyl-terminated silicon (0 0 1) surface

    NASA Astrophysics Data System (ADS)

    Jeong, Yong-Chan; Baek, Seung-Bin; Kim, Dae-Hee; Kim, Ji-Su; Kim, Yeong-Cheol

    2013-09-01

    The initial reaction of silicon precursors with a varying number of dimethylamino (sbnd N(CH3)2) ligands on a hydroxyl-terminated silicon (0 0 1) surface was investigated using density functional theory. Five silicon precursors were chosen to evaluate their adsorption energy and reaction energy barrier as a function of the number of the sbnd N(CH3)2 ligands: silane (SiH4), dimethylaminosilane (SiH3[N(CH3)2]), bis-dimethylaminosilane (SiH2[N(CH3)2]2), tris-dimethylaminosilane (SiH[N(CH3)2]3), and tetrakis-dimethylaminosilane (Si[N(CH3)2]4). The adsorption energy increased with the number of the sbnd N(CH3)2 ligands, while the reaction energy barrier showed a parabolic behavior. We found that SiH3[N(CH3)2], SiH2[N(CH3)2]2, and SiH[N(CH3)2]3 could be recommended as the suitable Si precursors due to their high adsorption energies and low reaction energy barriers.

  15. Ab-initio simulations on initial growth steps of high-K oxides on silicon

    NASA Astrophysics Data System (ADS)

    Bloechl, Peter E.

    2003-03-01

    One of the most acute challenges of semiconductor industry is the introduction of new so-called high-K gate oxides. Conventional SiO2 based gate oxides need to be replaced in order to avoid quantum mechanical leakage currents through ultrathin oxide layers. State of the art electronic structure calculations and ab-initio molecular dynamics simulations of the deposition of metals onto silicon and the formation of oxides have been performed. Atomic structure, chemical binding and electronic structure have been analyzed for a wide range of different adsorption structures of Zr, Hf, and Sr on silicon. Silicide formation and the step-wise formation of the oxides have been investigated. Particular emphasis will be given to the formation of the interface between SrTiO3 and silicon (001).

  16. P-type transparent conducting oxides

    NASA Astrophysics Data System (ADS)

    Zhang, Kelvin H. L.; Xi, Kai; Blamire, Mark G.; Egdell, Russell G.

    2016-09-01

    Transparent conducting oxides constitute a unique class of materials combining properties of electrical conductivity and optical transparency in a single material. They are needed for a wide range of applications including solar cells, flat panel displays, touch screens, light emitting diodes and transparent electronics. Most of the commercially available TCOs are n-type, such as Sn doped In2O3, Al doped ZnO, and F doped SnO2. However, the development of efficient p-type TCOs remains an outstanding challenge. This challenge is thought to be due to the localized nature of the O 2p derived valence band which leads to difficulty in introducing shallow acceptors and large hole effective masses. In 1997 Hosono and co-workers (1997 Nature 389 939) proposed the concept of ‘chemical modulation of the valence band’ to mitigate this problem using hybridization of O 2p orbitals with close-shell Cu 3d 10 orbitals. This work has sparked tremendous interest in designing p-TCO materials together with deep understanding the underlying materials physics. In this article, we will provide a comprehensive review on traditional and recently emergent p-TCOs, including Cu+-based delafossites, layered oxychalcogenides, nd 6 spinel oxides, Cr3+-based oxides (3d 3) and post-transition metal oxides with lone pair state (ns 2). We will focus our discussions on the basic materials physics of these materials in terms of electronic structures, doping and defect properties for p-type conductivity and optical properties. Device applications based on p-TCOs for transparent p-n junctions will also be briefly discussed.

  17. P-type transparent conducting oxides.

    PubMed

    Zhang, Kelvin H L; Xi, Kai; Blamire, Mark G; Egdell, Russell G

    2016-09-28

    Transparent conducting oxides constitute a unique class of materials combining properties of electrical conductivity and optical transparency in a single material. They are needed for a wide range of applications including solar cells, flat panel displays, touch screens, light emitting diodes and transparent electronics. Most of the commercially available TCOs are n-type, such as Sn doped In2O3, Al doped ZnO, and F doped SnO2. However, the development of efficient p-type TCOs remains an outstanding challenge. This challenge is thought to be due to the localized nature of the O 2p derived valence band which leads to difficulty in introducing shallow acceptors and large hole effective masses. In 1997 Hosono and co-workers (1997 Nature 389 939) proposed the concept of 'chemical modulation of the valence band' to mitigate this problem using hybridization of O 2p orbitals with close-shell Cu 3d (10) orbitals. This work has sparked tremendous interest in designing p-TCO materials together with deep understanding the underlying materials physics. In this article, we will provide a comprehensive review on traditional and recently emergent p-TCOs, including Cu(+)-based delafossites, layered oxychalcogenides, nd (6) spinel oxides, Cr(3+)-based oxides (3d (3)) and post-transition metal oxides with lone pair state (ns (2)). We will focus our discussions on the basic materials physics of these materials in terms of electronic structures, doping and defect properties for p-type conductivity and optical properties. Device applications based on p-TCOs for transparent p-n junctions will also be briefly discussed.

  18. Preparation of High Silicon Electrical Steel Sheets with Strong {100} Recrystallization Texture by the Texture Inheritance of Initial Columnar Grains

    NASA Astrophysics Data System (ADS)

    Pan, Hongjiang; Zhang, Zhihao; Xie, Jianxin

    2016-05-01

    Texture evolutions and recrystallization texture features in warm- and cold-rolled sheets of high silicon electrical steel with two different initial microstructures (columnar-grained and equiaxed-grained microstructures) were investigated. The relationships between the recrystallization textures and the initial textures (the textures before rolling) of the samples were analyzed. The results showed that after annealing at 1073 K (800 °C) for 1 hour, strong {100} recrystallization textures with volume fractions of more than 47 pct were obtained in the columnar-grained samples fabricated by warm and cold rolling along the growing direction of the columnar grains. While after rolling and annealing in the same processes, only 12.8 pct volume fractions of {100} recrystallization texture were revealed in the equiaxed-grained samples. The formation of strong {100} recrystallization texture in the annealed sheets of high silicon electrical steel with initial columnar grains was attributed to the favorable texture inheritance of the initial texture during rolling and annealing. The columnar grains of strong near {100}<001> ({100}<001> {310}<001>) orientation in the samples before rolling were transferred into deformed grains with orientations such as {100}<011> and {100}<012>. after rolling. Afterwards, these deformed grains were further transferred into {100} oriented recrystallized grains, which formed strong {100} recrystallization texture in the annealed sheets and exhibited preferable soft magnetic properties.

  19. Robustness up to 400°C of the passivation of c-Si by p-type a-Si:H thanks to ion implantation

    NASA Astrophysics Data System (ADS)

    Defresne, A.; Plantevin, O.; Roca i Cabarrocas, Pere

    2016-12-01

    Heterojunction solar cells based on crystalline silicon (c-Si) passivated by hydrogenated amorphous silicon (a-Si:H) thin films are one of the most promising architectures for high energy conversion efficiency. Indeed, a-Si:H thin films can passivate both p-type and n-type wafers and can be deposited at low temperature (<200°C) using PECVD. However, such passivation layers, in particular p-type a-Si:H, show a dramatic degradation in passivation quality above 200°C. Yet, annealing at 300 - 400°C the TCO layer and metallic contacts is highly desirable to reduce the contact resistance as well as the TCO optical absorption. In this work, we show that as expected, ion implantation (5 - 30 keV) introduces defects at the c-Si/a-Si:H interface which strongly degrade the effective lifetime, down to a few micro-seconds. However, the passivation quality can be restored and lifetime values can be improved up to 2 ms over the initial value with annealing. We show here that effective lifetimes above 1 ms can be maintained up to 380°C, opening up the possibility for higher process temperatures in silicon heterojunction device fabrication.

  20. Initial steps toward the realization of large area arrays of single photon counting pixels based on polycrystalline silicon TFTs

    NASA Astrophysics Data System (ADS)

    Liang, Albert K.; Koniczek, Martin; Antonuk, Larry E.; El-Mohri, Youcef; Zhao, Qihua; Jiang, Hao; Street, Robert A.; Lu, Jeng Ping

    2014-03-01

    The thin-film semiconductor processing methods that enabled creation of inexpensive liquid crystal displays based on amorphous silicon transistors for cell phones and televisions, as well as desktop, laptop and mobile computers, also facilitated the development of devices that have become ubiquitous in medical x-ray imaging environments. These devices, called active matrix flat-panel imagers (AMFPIs), measure the integrated signal generated by incident X rays and offer detection areas as large as ~43×43 cm2. In recent years, there has been growing interest in medical x-ray imagers that record information from X ray photons on an individual basis. However, such photon counting devices have generally been based on crystalline silicon, a material not inherently suited to the cost-effective manufacture of monolithic devices of a size comparable to that of AMFPIs. Motivated by these considerations, we have developed an initial set of small area prototype arrays using thin-film processing methods and polycrystalline silicon transistors. These prototypes were developed in the spirit of exploring the possibility of creating large area arrays offering single photon counting capabilities and, to our knowledge, are the first photon counting arrays fabricated using thin film techniques. In this paper, the architecture of the prototype pixels is presented and considerations that influenced the design of the pixel circuits, including amplifier noise, TFT performance variations, and minimum feature size, are discussed.

  1. Effect of the initial structure on the electrical property of crystalline silicon films deposited on glass by hot-wire chemical vapor deposition.

    PubMed

    Chung, Yung-Bin; Lee, Sang-Hoon; Bae, Sung-Hwan; Park, Hyung-Ki; Jung, Jae-Soo; Hwang, Nong-Moon

    2012-07-01

    Crystalline silicon films on an inexpensive glass substrate are currently prepared by depositing an amorphous silicon film and then crystallizing it by excimer laser annealing, rapid thermal annealing, or metal-induced crystallization because crystalline silicon films cannot be directly deposited on glass at a low temperature. It was recently shown that by adding HCI gas in the hot-wire chemical vapor deposition (HWCVD) process, the crystalline silicon film can be directly deposited on a glass substrate without additional annealing. The electrical properties of silicon films prepared using a gas mixture of SiH4 and HCl in the HWCVD process could be further improved by controlling the initial structure, which was achieved by adjusting the delay time in deposition. The size of the silicon particles in the initial structure increased with increasing delay time, which increased the mobility and decreased the resistivity of the deposited films. The 0 and 5 min delay times produced the silicon particle sizes of approximately 10 and approximately 28 nm, respectively, in the initial microstructure, which produced the final films, after deposition for 300 sec, of resistivities of 0.32 and 0.13 Omega-cm, mobilities of 1.06 and 1.48 cm2 V(-1) S(-1), and relative densities of 0.87 and 0.92, respectively.

  2. Initial stem cell adhesion on porous silicon surface: molecular architecture of actin cytoskeleton and filopodial growth

    NASA Astrophysics Data System (ADS)

    Collart-Dutilleul, Pierre-Yves; Panayotov, Ivan; Secret, Emilie; Cunin, Frédérique; Gergely, Csilla; Cuisinier, Frédéric; Martin, Marta

    2014-10-01

    The way cells explore their surrounding extracellular matrix (ECM) during development and migration is mediated by lamellipodia at their leading edge, acting as an actual motor pulling the cell forward. Lamellipodia are the primary area within the cell of actin microfilaments (filopodia) formation. In this work, we report on the use of porous silicon (pSi) scaffolds to mimic the ECM of mesenchymal stem cells from the dental pulp (DPSC) and breast cancer (MCF-7) cells. Our atomic force microscopy (AFM), fluorescence microscopy, and scanning electron microscopy (SEM) results show that pSi promoted the appearance of lateral filopodia protruding from the DPSC cell body and not only in the lamellipodia area. The formation of elongated lateral actin filaments suggests that pores provided the necessary anchorage points for protrusion growth. Although MCF-7 cells displayed a lower presence of organized actin network on both pSi and nonporous silicon, pSi stimulated the formation of extended cell protrusions.

  3. Cell adhesion response on femtosecond laser initiated liquid assisted silicon surface.

    PubMed

    Ulmeanu, M; Sima, L E; Ursescu, D; Enculescu, M; Bazan, X; Quintana, I

    2014-03-01

    Silicon substrates were irradiated at normal incidence with a femtosecond Ti:sapphire laser (Quatronix, 90 fs pulse duration, 1 kHz repetition rate, M(2) ~ 1.2, maximum energy peak 350 mJ ) operating at a wavelength of 400 nm and focused via a microscope objective (Newport; UV Objective Model, 37x 0.11 N.A.). The laser scanning was assisted by liquids precursors media such as methanol and 1,1,2-trichlorotrifluoroethane. By altering the processing parameters, such as incident laser energy, scanning speed, and different irradiation media, various surface structures were produced on areas with 1 mm(2) dimensions. We analyzed the dependence of the surface morphology on laser pulse energy, scanning speed and irradiation media. Well ordered areas are developed without imposing any boundary conditions for the capillary waves that coarsens the ripple pattern. To assess biomaterial-driven cell adhesion response we investigated actin filaments organization and cell morphological changes following growth onto processed silicon substrates. Our study of bone cell progenitor interaction with laser nanoprocessed silicon lines has shown that cells anchor mainly to contact points along the nanostructured surface. Consequently, actin filaments are stretched towards the 15 µm wide parallel lines increasing lateral cell spreading and changing the bipolar shape of mesenchymal stem cells.

  4. Computational Study of Field Initiated Surface Reactions for Synthesis of Diamond and Silicon

    NASA Technical Reports Server (NTRS)

    Musgrave, Charles Bruce

    1999-01-01

    This project involves using quantum chemistry to simulate surface chemical reactions in the presence of an electric field for nanofabrication of diamond and silicon. A field delivered by a scanning tunneling microscope (STM) to a nanometer scale region of a surface affects chemical reaction potential energy surfaces (PES) to direct atomic scale surface modification to fabricate sub-nanometer structures. Our original hypothesis is that the applied voltage polarizes the charge distribution of the valence electrons and that these distorted molecular orbitals can be manipulated with the STM so as to change the relative stabilities of the electronic configurations over the reaction coordinates and thus the topology of the PES and reaction kinetics. Our objective is to investigate the effect of applied bias on surface reactions and the extent to which STM delivered fields can be used to direct surface chemical reactions on an atomic scale on diamond and silicon. To analyze the fundamentals of field induced chemistry and to investigate the application of this technique for the fabrication of nanostructures, we have employed methods capable of accurately describing molecular electronic structure. The methods we employ are density functional theory (DFT) quantum chemical (QC) methods. To determine the effect of applied bias on surface reactions we have calculated the QC PESs in various applied external fields for various reaction steps for depositing or etching diamond and silicon. We have chosen reactions which are thought to play a role in etching and the chemical vapor deposition growth of Si and diamond. The PESs of the elementary reaction steps involved are then calculated under the applied fields, which we vary in magnitude and configuration. We pay special attention to the change in the reaction barriers, and transition state locations, and search for low energy reaction channels which were inaccessible without the applied bias.

  5. A new partial SOI power device structure with P-type buried layer

    NASA Astrophysics Data System (ADS)

    Duan, Baoxing; Zhang, Bo; Li, Zhaoji

    2005-12-01

    A new BPSOI (buried layer partial SOI) structure is developed, in which the P-type buried layer is implanted into the P - substrate by silicon window underneath the source of the conventional PSOI. The mechanism of breakdown is that the additional electric field produced by P-type buried layer charges modulates surface electric field, which decreases drastically the electric field peaks near the drain and source junctions. Moreover, the on-resistance of BPSOI is decreased as a result of increasing drift region doping due to neutralism of P-type buried layer. The results indicate that the breakdown voltage of BPSOI is increased by 52-58% and the on-resistance is decreased by 45-48% in comparison to conventional PSOI in virtue of 2-D numerical simulations using MEDICI.

  6. Initial stem cell adhesion on porous silicon surface: molecular architecture of actin cytoskeleton and filopodial growth

    PubMed Central

    2014-01-01

    The way cells explore their surrounding extracellular matrix (ECM) during development and migration is mediated by lamellipodia at their leading edge, acting as an actual motor pulling the cell forward. Lamellipodia are the primary area within the cell of actin microfilaments (filopodia) formation. In this work, we report on the use of porous silicon (pSi) scaffolds to mimic the ECM of mesenchymal stem cells from the dental pulp (DPSC) and breast cancer (MCF-7) cells. Our atomic force microscopy (AFM), fluorescence microscopy, and scanning electron microscopy (SEM) results show that pSi promoted the appearance of lateral filopodia protruding from the DPSC cell body and not only in the lamellipodia area. The formation of elongated lateral actin filaments suggests that pores provided the necessary anchorage points for protrusion growth. Although MCF-7 cells displayed a lower presence of organized actin network on both pSi and nonporous silicon, pSi stimulated the formation of extended cell protrusions. PMID:25386101

  7. Silicon Carbide Photoconductive Switches

    DTIC Science & Technology

    1994-09-01

    The optoelectronic properties of p-type 6-H silicon carbide (6H-SiC) have been investigated in an experiment that used lateral and vertical...and the bandgap was determined to be approximately 3.1 eV. 6H-SiC, Photoconductive, Photovoltaic, Absorption coefficient, Switch, Silicon carbide

  8. Experimental and numerical investigation of crack initiation and propagation in silicon nitride ceramic under rolling and cyclic contact

    NASA Astrophysics Data System (ADS)

    Raga, Rahul; Khader, Iyas; Zdeněk, Chlup; Kailer, Andreas

    2017-05-01

    The focus of the work was to investigate crack initiation and propagation mechanisms in silicon nitride undergoing non-conforming hybrid contact under various tribological conditions. In order to understand the prevailing modes of damage in silicon nitride, two distinct model experiments were proposed, namely, rolling contact and cyclic contact experiments. The rolling contact experiment was designed in order to mimic the contact conditions appearing in hybrid bearings at contact pressures ranging from 3 to 6 GPa. On the other hand, cyclic contact experiments with stresses ranging from 4 to 15 GPa under different media were carried out to study damage under localised stresses. In addition, the experimentally observed cracks were implemented in a finite element model to study the stress redistribution and correlate the generated stresses with the corresponding mechanisms. Crack propagation under rolling contact was attributed to two different mechanisms, namely, fatigue induced fracture and lubricant driven crack propagation. The numerical simulations shed light on the tensile stress driven surface and subsurface crack propagation mechanisms. On the other hand, the cyclic contact experiments showed delayed crack formation for lubricated cyclic contact. Ceramographic cross-sectional analysis showed crack patterns similar to Hertzian crack propagation under cyclic contact load.

  9. View from Silicon Valley: Maximizing the Scientific Impact of Global Brain Initiatives through Entrepreneurship.

    PubMed

    Joshi, Pushkar S; Ghosh, Kunal K

    2016-11-02

    In this era of technology-driven global neuroscience initiatives, the role of the neurotechnology industry remains woefully ambiguous. Here, we explain why industry is essential to the success of these global initiatives, and how it can maximize the scientific impact of these efforts by (1) scaling and ultimately democratizing access to breakthrough neurotechnologies, and (2) commercializing technologies as part of integrated, end-to-end solutions that accelerate neuroscientific discovery. Copyright © 2016 Elsevier Inc. All rights reserved.

  10. Ensemble Monte Carlo calculation of the hole initiated impact ionization rate in bulk GaAs and silicon using a k-dependent, numerical transition rate formulation

    NASA Technical Reports Server (NTRS)

    Oguzman, Ismail H.; Wang, Yang; Kolnik, Jan; Brennan, Kevin F.

    1995-01-01

    The hole initiated impact ionization rate in bulk silicon and GaAs is calculated using a numerical formulation of the impact ionization transition rate incorporated into an ensemble Monte Carlo simulation. The transition rate is calculated from Fermi's golden rule using a two-body screened Coulomb interaction including a wavevector dependent dielectric function. It is found that the effective threshold for hole initiated ionization is relatively soft in both materials, that the split-off band dominates the ionization process in GaAs. and that no clear dominance by any one band is observed in silicon, though the rate out of the light hole band is greatest.

  11. [Prevention of postenucleation syndrome: the hydroxylapatite silicone implant. Preliminary experimental studies and initial clinical experiences].

    PubMed

    Guthoff, R; Vick, H P; Schaudig, U

    1995-04-01

    An orbital implant after enucleation compensates for volume deficiency and increases prosthesis motility. In the literature, however, an extrusion rate of orbital implant between 10 and 25% is reported. Since the introduction of hydroxylapatic ceramics (HAC), these numbers have been reduced considerably. The HAC, which is derived from corals, has a rough surface and requires a scleral covering for implantation. The HAC, which is made in the laboratory, can be produced with smoother surfaces, so that a homoplastic covering is no longer mandatory. A composite implant was developed to improve prosthesis motility further. This consists of artificial HAC at its anterior surface to guarantee safe tissue integration; the posterior part of the implant is manufactured from silicon rubber to create a jointlike structure in Tenon's capsule. Integration of the porous HAC in the orbital soft tissues has been tested and confirmed by animal experiments. After 30 full HAC implants and 25 composite implants, only one extrusion occurred. In all other cases, compatibility proved to be excellent; transmission of the motility to the prosthesis was moderate to good. Examinations comparing prosthesis motility and computer tomographically evaluated implant motility enabled the analysis of deficits in motility transmission of the implant for the artificial eye.

  12. Initial results of a silicon sensor irradiation study for ILC extreme forward calorimetry

    NASA Astrophysics Data System (ADS)

    Band, Reyer; Fadeyev, Vitaliy; Field, R. Clive; Key, Spencer; Kim, Tae Sung; Markiewicz, Thomas; Martinez-McKinney, Forest; Maruyama, Takashi; Mistry, Khilesh; Nidumolu, Ravi; Schumm, Bruce A.; Spencer, Edwin; Timlin, Conor; Wilder, Max

    2014-11-01

    Detectors proposed for the International Linear Collider (ILC) incorporate a tungsten sampling calorimeter ('BeamCal') intended to reconstruct showers of electrons, positrons and photons that emerge from the interaction point of the collider with angles between 5 and 50 milliradians. For the innermost radius of this calorimeter, radiation doses at shower-max are expected to reach 100 MRad per year, primarily due to minimum-ionizing electrons and positrons that arise in the induced electromagnetic showers of e+e- 'beamstrahlung' pairs produced in the ILC beam-beam interaction. However, radiation damage to calorimeter sensors may be dominated by hadrons induced by nuclear interactions of shower photons, which are much more likely to contribute to the non-ionizing energy loss that has been observed to damage sensors exposed to hadronic radiation. We report here on the results of SLAC Experiment T-506, for which several different types of silicon diode sensors were exposed to doses of radiation induced by showering electrons of energy 3.5-10.6 GeV. By embedding the sensor under irradiation within a tungsten radiator, the exposure incorporated hadronic species that would potentially contribute to the degradation of a sensor mounted in a precision sampling calorimeter. Depending on sensor technology, efficient charge collection was observed for doses as large as 220 MRad.

  13. Angular sensitivity of modeled scientific silicon charge-coupled devices to initial electron direction

    NASA Astrophysics Data System (ADS)

    Plimley, Brian; Coffer, Amy; Zhang, Yigong; Vetter, Kai

    2016-08-01

    Previously, scientific silicon charge-coupled devices (CCDs) with 10.5-μm pixel pitch and a thick (650 μm), fully depleted bulk have been used to measure gamma-ray-induced fast electrons and demonstrate electron track Compton imaging. A model of the response of this CCD was also developed and benchmarked to experiment using Monte Carlo electron tracks. We now examine the trade-off in pixel pitch and electronic noise. We extend our CCD response model to different pixel pitch and readout noise per pixel, including pixel pitch of 2.5 μm, 5 μm, 10.5 μm, 20 μm, and 40 μm, and readout noise from 0 eV/pixel to 2 keV/pixel for 10.5 μm pixel pitch. The CCD images generated by this model using simulated electron tracks are processed by our trajectory reconstruction algorithm. The performance of the reconstruction algorithm defines the expected angular sensitivity as a function of electron energy, CCD pixel pitch, and readout noise per pixel. Results show that our existing pixel pitch of 10.5 μm is near optimal for our approach, because smaller pixels add little new information but are subject to greater statistical noise. In addition, we measured the readout noise per pixel for two different device temperatures in order to estimate the effect of temperature on the reconstruction algorithm performance, although the readout is not optimized for higher temperatures. The noise in our device at 240 K increases the FWHM of angular measurement error by no more than a factor of 2, from 26° to 49° FWHM for electrons between 425 keV and 480 keV. Therefore, a CCD could be used for electron-track-based imaging in a Peltier-cooled device.

  14. Contact printing of horizontally-aligned p-type Zn₃P₂ nanowire arrays for rigid and flexible photodetectors.

    PubMed

    Yu, Gang; Liang, Bo; Huang, Hongtao; Chen, Gui; Liu, Zhe; Chen, Di; Shen, Guozhen

    2013-03-08

    Zn(3)P(2) is an important p-type semiconductor with the ability to detect almost all visible and ultraviolet light. By using the simple and efficient contact printing process, we reported the assembly of horizontally-aligned p-type Zn(3)P(2) nanowire arrays to be used as building blocks for high performance photodetectors. Horizontally-aligned Zn(3)P(2) nanowire arrays were first printed on silicon substrate to make thin-film transistors, exhibiting typical p-type transistor behavior with a high on/off ratio of 10(3). Besides, the Zn(3)P(2) nanowire array based devices showed a substantial response to illuminated lights with a wide range of wavelengths and densities. Flexible photodetectors were also fabricated by contact printing of horizontally-aligned Zn(3)P(2) nanowire arrays on flexible PET substrate, showing a comparable performance to the device on rigid silicon substrate.

  15. Soft error rate simulation and initial design considerations of neutron intercepting silicon chip (NISC)

    NASA Astrophysics Data System (ADS)

    Celik, Cihangir

    -scale technologies. Prevention of SEEs has been studied and applied in the semiconductor industry by including radiation protection precautions in the system architecture or by using corrective algorithms in the system operation. Decreasing 10B content (20%of natural boron) in the natural boron of Borophosphosilicate glass (BPSG) layers that are conventionally used in the fabrication of semiconductor devices was one of the major radiation protection approaches for the system architecture. Neutron interaction in the BPSG layer was the origin of the SEEs because of the 10B (n,alpha) 7Li reaction products. Both of the particles produced have the capability of ionization in the silicon substrate region, whose thickness is comparable to the ranges of these particles. Using the soft error phenomenon in exactly the opposite manner of the semiconductor industry can provide a new neutron detection system based on the SERs in the semiconductor memories. By investigating the soft error mechanisms in the available semiconductor memories and enhancing the soft error occurrences in these devices, one can convert all memory using intelligent systems into portable, power efficient, directiondependent neutron detectors. The Neutron Intercepting Silicon Chip (NISC) project aims to achieve this goal by introducing 10B-enriched BPSG layers to the semiconductor memory architectures. This research addresses the development of a simulation tool, the NISC Soft Error Analysis Tool (NISCSAT), for soft error modeling and analysis in the semiconductor memories to provide basic design considerations for the NISC. NISCSAT performs particle transport and calculates the soft error probabilities, or SER, depending on energy depositions of the particles in a given memory node model of the NISC. Soft error measurements were performed with commercially available, off-the-shelf semiconductor memories and microprocessors to observe soft error variations with the neutron flux and memory supply voltage. Measurement

  16. Plasticity initiation and evolution during nanoindentation of an iron-3% silicon crystal.

    PubMed

    Zhang, Ling; Ohmura, Takahito

    2014-04-11

    Our investigations confirm that the collective, avalanchelike dislocation nucleation and multiplication is responsible for the pop-in event in a body-centered-cubic Fe-3% Si single crystal. Dislocation was not observed prior to pop-in but was apparent after the event. We find that a transition from an initial stage dominated by discrete dislocation nucleation to subsequent continuum plasticity occurs just after the pop-in event as elastoplastic deformation ensues.

  17. Independence of interrupted coarsening on initial system order: ion-beam nanopatterning of amorphous versus crystalline silicon targets.

    PubMed

    Muñoz-García, J; Gago, R; Cuerno, R; Sánchez-García, J A; Redondo-Cubero, A; Castro, M; Vázquez, L

    2012-09-19

    Interrupted coarsening (IC) has recently been identified as an important feature for the dynamics of the typical length-scale in pattern-forming systems on surfaces. In practice, it can be beneficial to improve pattern ordering since it combines a certain degree of defect suppression with a limited increase in the typical pattern wavelength. However, little is known about its robustness with respect to changes in the preparation of the initial system for cases with potential applications. Working in the context of nano-scale pattern formation by ion-beam sputtering (IBS), we prove that IC properties do not depend on sample preparation. Specifically, interface dynamics under IBS is quantitatively compared on virgin amorphous and crystalline silicon surfaces, using 1 keV Ar(+) ions at normal incidence where nanodot pattern formation is triggered by concurrent co-deposition of Fe atoms during processing. Atomic force microscopy shows that dot patterns with similar spatial order and dynamics are obtained in both cases, underscoring the key dynamical role of the amorphous surface layer produced by irradiation. Both systems have been quantitatively described by an effective interface equation. We employ a new procedure based on the linear growth of the initial surface correlations to accurately estimate the equation coefficients. Such a method improves the predictive power of the interface equation with respect to previous studies and leads to a better description of the experimental pattern and its dynamical features.

  18. Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography

    NASA Astrophysics Data System (ADS)

    Ulmeanu, M.; Petkov, P.; Ursescu, D.; Maraloiu, V. A.; Jipa, F.; Brousseau, E.; Ashfold, M. N. R.

    2015-11-01

    We report sub-diffraction limited patterning of Si substrate surfaces by laser-initiated liquid-assisted colloidal lithography. The technique involves exposing a two-dimensional lattice of transparent colloidal particles spin coated on the substrate of interest (here Si) immersed in a liquid (e.g. methanol, acetone, carbon tetrachloride, toluene) to a single picosecond pulse of ultraviolet laser radiation. Surface patterns formed using colloidal particles with different radii in the range 195 nm ≤ R ≤ 1.5 μm and liquids with differing indices of refraction (nliquid) are demonstrated, the detailed topographies of which are sensitively dependent upon whether the index of refraction of the colloidal particle (ncolloid) is greater or smaller than nliquid (i.e. upon whether the incident light converges or diverges upon interaction with the particle). The spatial intensity modulation formed by diffraction of the single laser pulse by the colloidal particles is imprinted into the Si substrate.

  19. An integrated driving circuit implemented with p-type LTPS TFTs for AMOLED

    NASA Astrophysics Data System (ADS)

    Zhao, Li-Qing; Wu, Chun-Ya; Hao, Da-Shou; Yao, Ying; Meng, Zhi-Guo; Xiong, Shao-Zhen

    2009-03-01

    Based on the technology of low temperature poly silicon thin film transistors (poly-Si-TFTs), a novel p-type TFT AMOLED panel with self-scanned driving circuit is introduced in this paper. A shift register formed with novel p-type TFTs is proposed to realize the gate driver. A flip-latch cooperated with the shift register is designed to conduct the data writing. In order to verify the validity of the proposed design, the circuits are simulated with SILVACO TCAD tools, using the MODEL in which the parameters of LTPS TFTs were extracted from the LTPS TFTs made in our lab. The simulation results indicate that the circuit can fulfill the driving function.

  20. Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography.

    PubMed

    Ulmeanu, M; Petkov, P; Ursescu, D; Maraloiu, V A; Jipa, F; Brousseau, E; Ashfold, M N R

    2015-11-13

    We report sub-diffraction limited patterning of Si substrate surfaces by laser-initiated liquid-assisted colloidal lithography. The technique involves exposing a two-dimensional lattice of transparent colloidal particles spin coated on the substrate of interest (here Si) immersed in a liquid (e.g. methanol, acetone, carbon tetrachloride, toluene) to a single picosecond pulse of ultraviolet laser radiation. Surface patterns formed using colloidal particles with different radii in the range 195 nm ≤ R ≤ 1.5 μm and liquids with differing indices of refraction (n(liquid)) are demonstrated, the detailed topographies of which are sensitively dependent upon whether the index of refraction of the colloidal particle (n(colloid)) is greater or smaller than n liquid (i.e. upon whether the incident light converges or diverges upon interaction with the particle). The spatial intensity modulation formed by diffraction of the single laser pulse by the colloidal particles is imprinted into the Si substrate.

  1. Spin-Pump-Induced Spin Transport in p-Type Si at Room Temperature

    NASA Astrophysics Data System (ADS)

    Shikoh, Eiji; Ando, Kazuya; Kubo, Kazuki; Saitoh, Eiji; Shinjo, Teruya; Shiraishi, Masashi

    2013-03-01

    A spin battery concept is applied for the dynamical generation of pure spin current and spin transport in p-type silicon (p-Si). Ferromagnetic resonance and effective s-d coupling in Ni80Fe20 results in spin accumulation at the Ni80Fe20/p-Si interface, inducing spin injection and the generation of spin current in the p-Si. The pure spin current is converted to a charge current by the inverse spin Hall effect of Pd evaporated onto the p-Si. This approach demonstrates the generation and transport of pure spin current in p-Si at room temperature.

  2. Fabrication and morphology of porous p-type SiC

    NASA Astrophysics Data System (ADS)

    Shishkin, Y.; Ke, Y.; Devaty, R. P.; Choyke, W. J.

    2005-02-01

    Porous silicon carbide fabricated from p-type 4H and 6H SiC wafers by electrochemical etching in hydrofluoric electrolyte is studied. An investigation of the dependence on wafer polarity reveals that pore formation is favored on the C face while complete dissolution occurs on the Si face. When the etching is done on the C face, the pore wall thickness decreases with increasing current density. The morphology of the front surface of the sample depends on the prior treatment of the workpiece surface. The porosity is estimated based on the analysis of scanning electron microscope images, charge-transfer calculations, and gravimetric analysis.

  3. Spin-pump-induced spin transport in p-type Si at room temperature.

    PubMed

    Shikoh, Eiji; Ando, Kazuya; Kubo, Kazuki; Saitoh, Eiji; Shinjo, Teruya; Shiraishi, Masashi

    2013-03-22

    A spin battery concept is applied for the dynamical generation of pure spin current and spin transport in p-type silicon (p-Si). Ferromagnetic resonance and effective s-d coupling in Ni(80)Fe(20) results in spin accumulation at the Ni(80)Fe(20)/p-Si interface, inducing spin injection and the generation of spin current in the p-Si. The pure spin current is converted to a charge current by the inverse spin Hall effect of Pd evaporated onto the p-Si. This approach demonstrates the generation and transport of pure spin current in p-Si at room temperature.

  4. Initial comfort of lotrafilcon A silicone hydrogel contact lenses versus etafilcon A contact lenses for extended wear.

    PubMed

    Martin, Raul; de Juan, Victoria; Rodriguez, Guadalupe; Martin, Sofia; Fonseca, Soraya

    2007-03-01

    To compare the initial comfort afforded by silicone hydrogel lenses (lotrafilcon A) versus the comfort afforded by conventional hydrogel lenses (etafilcon A) in extended wear (EW). Prospective, double-masked and randomized controlled trial. Lotrafilcon A and etafilcon A contact lenses were eye randomly fitted on an EW basis for 7 days and nights in 20 subjects. A forced-choice subject preference questionnaire was made. Subjects were comfort, dryness, red eye and visual quality after night wear and at the end of the day. Subjective scored satisfaction (scale: 1-5) and lens preference were assessed. Lotrafilcon A proved more comfortable after night wear (60%, CI95% 38-82%) and at the end of the day (70%, CI95% 49-90%) than etafilcon A after night wear (10%, CI95% 0-23%, P<0.05) and at the end of the day (20%, CI95% 2-38%, P<0.05). The feeling of dryness was more marked with etafilcon A after night wear (50%, CI95% 27-72%) and at the end of the day (50%, CI95% 27-72%) than it was with lotrafilcon A (15%, CI95% 0%-31%) after night wear (P>0.05) and at the end of the day (25%, CI95% 5%-44%, P<0.05). General satisfaction with the lotrafilcon A lens was 3.65 points (CI95% 3-4.2) and with etafilcon A 2.95 points (CI95% 2.5-3.3, P<0.05). Eighty percent (CI95% 62%-98%) of subjects preferred lotrafilcon A (P<0.05) for EW. In EW, lotrafilcon A contact lenses were more comfortable and led to less dryness after night wear and at the end of the day than etafilcon A contact lenses.

  5. Sb-doped p-type ZnO and its application on light emitting devices

    NASA Astrophysics Data System (ADS)

    Chu, Sheng; Leela, Leelaprasanna J.; Yang, Zheng; Lim, Jae Hong; Li, Lin; Liu, Jianlin

    2008-03-01

    Reliable Sb-doped p-type ZnO on silicon substrate was grown by molecular beam epitaxy. The hole concentrations up to 10^19/cm^3 were achieved by tuning the Sb cell temperature. The results from XPS and photoluminescence spectrum confirmed the theoretical prediction that the Sb doping mechanism in ZnO is the formation of complex shallow acceptor SbZn+2VZn, with a low ionization energy of about 150meV. Then ZnO p-n homojunction light emitting diodes (LED) were fabricated based on the p-type Sb-doped layer, and the Ga-doped n-type ZnO layer. Low specific resistivity Au/NiO and Au/Ti contacts were deposited on top of the p-type and n-type layers, respectively, and the contacts were annealed to obtain ohmic conduction. Electroluminescence measurements were performed on the devices under different temperatures and injection currents. Strong near-band edge emissions were clearly observed at room and low temperatures. The device exhibited dominant UV peak at 3.31eV over the deep level emissions at 9K, which is the result from the large build in potential in the junction and the good film quality.

  6. Surface polishing by electrochemical etching of p-type 4H SiC

    NASA Astrophysics Data System (ADS)

    Ke, Y.; Yan, F.; Devaty, R. P.; Choyke, W. J.

    2009-09-01

    Electrochemical polishing of Si- and C-face p-type 4H SiC has been performed. Polishing the Si face leads to a smoother surface compared to the C face within the range of etching conditions studied. However, the results of additional experiments on C-face samples indicate that polishing a lower doped p-type material leads to improved surface quality for this face. Differences in polishing on the two faces are interpreted in terms of preferred electrochemical etching directions in SiC. Etching conditions such as HF concentration, doping, and etching current density were varied to obtain optimized values. Current-voltage plots (voltammograms) show a maximum electrochemical current density for the process. The polishing should be performed at a constant current density near this peak value to obtain both a smooth surface and a rapid rate of removal of material. In contrast to electrochemical polishing of silicon, we suggest that the applied current should match the rate at which the electrolyte can supply ions for reaction to obtain the smoothest surface required for microelectromechanical system device fabrication. Based on the experiments, we propose that, to obtain the smoothest SiC surface using electrochemical polishing, etching should be performed on Si-face p-type 4H SiC in dilute HF solution at the optimum current density determined by the current-voltage measurements.

  7. Synthesis of p-type GaN nanowires.

    PubMed

    Kim, Sung Wook; Park, Youn Ho; Kim, Ilsoo; Park, Tae-Eon; Kwon, Byoung Wook; Choi, Won Kook; Choi, Heon-Jin

    2013-09-21

    GaN has been utilized in optoelectronics for two decades. However, p-type doping still remains crucial for realization of high performance GaN optoelectronics. Though Mg has been used as a p-dopant, its efficiency is low due to the formation of Mg-H complexes and/or structural defects in the course of doping. As a potential alternative p-type dopant, Cu has been recognized as an acceptor impurity for GaN. Herein, we report the fabrication of Cu-doped GaN nanowires (Cu:GaN NWs) and their p-type characteristics. The NWs were grown vertically via a vapor-liquid-solid (VLS) mechanism using a Au/Ni catalyst. Electrical characterization using a nanowire-field effect transistor (NW-FET) showed that the NWs exhibited n-type characteristics. However, with further annealing, the NWs showed p-type characteristics. A homo-junction structure (consisting of annealed Cu:GaN NW/n-type GaN thin film) exhibited p-n junction characteristics. A hybrid organic light emitting diode (OLED) employing the annealed Cu:GaN NWs as a hole injection layer (HIL) also demonstrated current injected luminescence. These results suggest that Cu can be used as a p-type dopant for GaN NWs.

  8. Compensated amorphous silicon solar cell

    DOEpatents

    Carlson, David E.

    1980-01-01

    An amorphous silicon solar cell incorporates a region of intrinsic hydrogenated amorphous silicon fabricated by a glow discharge wherein said intrinsic region is compensated by P-type dopants in an amount sufficient to reduce the space charge density of said region under illumination to about zero.

  9. Adsorption of fibrinogen and lysozyme on silicon grafted with poly(2-methacryloyloxyethyl phosphorylcholine) via surface-initiated atom transfer radical polymerization.

    PubMed

    Feng, Wei; Zhu, Shiping; Ishihara, Kazuhiko; Brash, John L

    2005-06-21

    Surfaces based on grafted poly(2-methacryloyloxyethyl phosphorylcholine) (poly(MPC)) "brushes" with a constant graft density of 0.39 chain/nm2 and chain length from 5 to 200 monomer units were prepared by surface-initiated atom transfer radical polymerization (ATRP) on silicon wafers. The chain length and layer thickness of the poly(MPC) grafts were varied via the ratio of MPC to sacrificial initiator. The surfaces were characterized by water contact angle, XPS, and AFM. The effect of poly(MPC) chain length on fibrinogen and lysozyme adsorption was studied in TBS buffer at pH 7.4. The adsorption of both proteins on the poly(MPC)-grafted surfaces was greatly reduced compared to the unmodified silicon. Adsorption decreased with increasing chain length of the poly(MPC) grafts. Grafts of chain length 200 (MW 59 000) gave adsorption levels of 7 and 2 ng/cm2, respectively, for fibrinogen and lysozyme at 1 mg/mL protein concentration, corresponding to reductions of greater than 98% compared to the unmodified silicon. Adsorption experiments using mixtures of the two proteins showed that the suppression of protein adsorption on the poly(MPC)-grafted surfaces was not strongly dependent on protein size or charge.

  10. Fabrication and Characterization of a Porous Silicon Drug Delivery System with an Initiated Chemical Vapor Deposition Temperature-Responsive Coating.

    PubMed

    McInnes, Steven J P; Szili, Endre J; Al-Bataineh, Sameer A; Vasani, Roshan B; Xu, Jingjing; Alf, Mahriah E; Gleason, Karen K; Short, Robert D; Voelcker, Nicolas H

    2016-01-12

    This paper reports on the fabrication of a pSi-based drug delivery system, functionalized with an initiated chemical vapor deposition (iCVD) polymer film, for the sustainable and temperature-dependent delivery of drugs. The devices were prepared by loading biodegradable porous silicon (pSi) with a fluorescent anticancer drug camptothecin (CPT) and coating the surface with temperature-responsive poly(N-isopropylacrylamide-co-diethylene glycol divinyl ether) (pNIPAM-co-DEGDVE) or non-stimulus-responsive poly(aminostyrene) (pAS) via iCVD. CPT released from the uncoated oxidized pSi control with a burst release fashion (∼21 nmol/(cm(2) h)), and this was almost identical at temperatures both above (37 °C) and below (25 °C) the lower critical solution temperature (LCST) of the switchable polymer used, pNIPAM-co-DEGDVE (28.5 °C). In comparison, the burst release rate from the pSi-pNIPAM-co-DEGDVE sample was substantially slower at 6.12 and 9.19 nmol/(cm(2) h) at 25 and 37 °C, respectively. The final amount of CPT released over 16 h was 10% higher at 37 °C compared to 25 °C for pSi coated with pNIPAM-co-DEGDVE (46.29% vs 35.67%), indicating that this material can be used to deliver drugs on-demand at elevated temperatures. pSi coated with pAS also displayed sustainable drug delivery profiles, but these were independent of the release temperature. These data show that sustainable and temperature-responsive delivery systems can be produced by functionalization of pSi with iCVD polymer films. Benefits of the iCVD approach include the application of the iCVD coating after drug loading without causing degradation of the drug commonly caused by exposure to factors such as solvents or high temperatures. Importantly, the iCVD process is applicable to a wide array of surfaces as the process is independent of the surface chemistry and pore size of the nanoporous matrix being coated.

  11. Process for forming retrograde profiles in silicon

    DOEpatents

    Weiner, K.H.; Sigmon, T.W.

    1996-10-15

    A process is disclosed for forming retrograde and oscillatory profiles in crystalline and polycrystalline silicon. The process consisting of introducing an n- or p-type dopant into the silicon, or using prior doped silicon, then exposing the silicon to multiple pulses of a high-intensity laser or other appropriate energy source that melts the silicon for short time duration. Depending on the number of laser pulses directed at the silicon, retrograde profiles with peak/surface dopant concentrations which vary are produced. The laser treatment can be performed in air or in vacuum, with the silicon at room temperature or heated to a selected temperature.

  12. Process for forming retrograde profiles in silicon

    DOEpatents

    Weiner, Kurt H.; Sigmon, Thomas W.

    1996-01-01

    A process for forming retrograde and oscillatory profiles in crystalline and polycrystalline silicon. The process consisting of introducing an n- or p-type dopant into the silicon, or using prior doped silicon, then exposing the silicon to multiple pulses of a high-intensity laser or other appropriate energy source that melts the silicon for short time duration. Depending on the number of laser pulses directed at the silicon, retrograde profiles with peak/surface dopant concentrations which vary from 1-1e4 are produced. The laser treatment can be performed in air or in vacuum, with the silicon at room temperature or heated to a selected temperature.

  13. p-type conduction in sputtered indium oxide films

    SciTech Connect

    Stankiewicz, Jolanta; Alcala, Rafael; Villuendas, Francisco

    2010-05-10

    We report p-type conductivity in intrinsic indium oxide (IO) films deposited by magnetron sputtering on fused quartz substrates under oxygen-rich ambient. Highly oriented (111) films were studied by x-ray diffraction, optical absorption, and Hall effect measurements. We fabricated p-n homojunctions on these films.

  14. High carrier concentration p-type transparent conducting oxide films

    DOEpatents

    Yan, Yanfa; Zhang, Shengbai

    2005-06-21

    A p-type transparent conducting oxide film is provided which is consisting essentially of, the transparent conducting oxide and a molecular doping source, the oxide and doping source grown under conditions sufficient to deliver the doping source intact onto the oxide.

  15. Purified silicon production system

    DOEpatents

    Wang, Tihu; Ciszek, Theodore F.

    2004-03-30

    Method and apparatus for producing purified bulk silicon from highly impure metallurgical-grade silicon source material at atmospheric pressure. Method involves: (1) initially reacting iodine and metallurgical-grade silicon to create silicon tetraiodide and impurity iodide byproducts in a cold-wall reactor chamber; (2) isolating silicon tetraiodide from the impurity iodide byproducts and purifying it by distillation in a distillation chamber; and (3) transferring the purified silicon tetraiodide back to the cold-wall reactor chamber, reacting it with additional iodine and metallurgical-grade silicon to produce silicon diiodide and depositing the silicon diiodide onto a substrate within the cold-wall reactor chamber. The two chambers are at atmospheric pressure and the system is open to allow the introduction of additional source material and to remove and replace finished substrates.

  16. Microwave Induced Direct Bonding of Single Crystal Silicon Wafers

    NASA Technical Reports Server (NTRS)

    Budraa, N. K.; Jackson, H. W.; Barmatz, M.

    1999-01-01

    We have heated polished doped single-crystal silicon wafers in a single mode microwave cavity to temperatures where surface to surface bonding occurred. The absorption of microwaves and heating of the wafers is attributed to the inclusion of n-type or p-type impurities into these substrates. A cylindrical cavity TM (sub 010) standing wave mode was used to irradiate samples of various geometry's at positions of high magnetic field. This process was conducted in vacuum to exclude plasma effects. This initial study suggests that the inclusion of impurities in single crystal silicon significantly improved its microwave absorption (loss factor) to a point where heating silicon wafers directly can be accomplished in minimal time. Bonding of these substrates, however, occurs only at points of intimate surface to surface contact. The inclusion of a thin metallic layer on the surfaces enhances the bonding process.

  17. Silicon nanowires and silicon/molecular interfaces for nanoscale electronics

    NASA Astrophysics Data System (ADS)

    Sheriff, Bonnie Ann

    This thesis describes the utilization of silicon nanowires and molecular films towards the realization of nanoscale electronics. The key enabling technology is the method in which the silicon nanowires are produced---the superlattice nanowire pattern transfer (SNAP) method. The SNAP method allows for the simultaneous formation and alignment of metal or semiconducting nanowires using a template-mediated approach. High-performance n- and p-type silicon nanowire field-effect transistors (FETs) were demonstrated. These FETs exhibited consistent performance and strong performance metrics such as high on/off ratios, high on-currents, high mobilities and low subthreshold swings. Due to the nanowire's large surface-area-to-volume ratio, surface states were shown to dominate performance, especially for the n-type FETs. Reducing the number of surface states improved performance significantly. N- and p-type silicon nanowire FETs were integrated into complementary symmetry (CS) logic circuits. This required the development of a pattern doping technique that allowed for spatial control of doped regions. The inverter circuit was fabricated and tested. A gain of ˜ 5 was consistently measured from 7 working inverter circuits. This demonstration provided the foundation for the eventual fabrication and characterization of the other Boolean logic functions. A methodology was developed that optimizes the design of high-performance logic circuits constructed from Si NW p- and n-type FETs. Circuit performance can be predicted from individual fabricated NW FETs before prototype circuits are manufactured, resulting in a faster and more efficient design process. These results suggest design options for fabricating high performance NW circuits, which can then be implemented experimentally. The effectiveness of this methodology is shown by optimizing the gain of Si NW complementary symmetry inverter from an initially measured value of 8 to a gain of 45. Lastly, methods to covalently attach

  18. P-type conductivity in annealed strontium titanate

    DOE PAGES

    Poole, Violet M.; Corolewski, Caleb D.; McCluskey, Matthew D.

    2015-12-17

    In this study, Hall-effect measurements indicate p-type conductivity in bulk, single-crystal strontium titanate (SrTiO3, or STO) samples that were annealed at 1200°C. Room temperature mobilities above 100 cm2/Vs were measured, an order of magnitude higher than those for electrons (5-10 cm2/Vs). Average hole densities were in the 109-1010 cm-3 range, consistent with a deep acceptor.

  19. Methodologies in Search of p-type Transparent Conductors

    NASA Astrophysics Data System (ADS)

    Lam, Kanber

    P-type transparent conductors are rare in nature but could lead to a lot technological innovations. A systematic search for p-type transparent conductors can be divided into two types: to search for (I) experimentally unknown compounds and (II) experimentally known ones. The difference between the two types of search lies in the fact that we always start with the experimental crystal structure in type II search while such information is lacking in the type I search. To make the type I research possible, a reasonably efficient method in predicting the ground state crystal structure is required. And the evolutionary algorithm with the real-space cut-and-splice method is a promising candidate for the task. For both type I and type II searches, we have to accurately predict the fundamental band gap and the hole conductivity. Corrections to density functional theory band gap, such as screened exchange LDA (sxLDA) or G0W0 , are required. The hole conductivity is linearly dependent on the hole concentration and inversely proportional to the hole effective mass. And we focused on the study of host material properties, the fundamental band gaps and hole effective masses, in the oxide sulfide family and eight promising candidates as p-type transparent conducting hosts were found. The hole population in the known transparent conducting oxides (TCOs) is mostly orig- inating from intrinsic point defects. However, a material La5Cu6O4S7 , whose hole conduc- tivity is an order of magnitude higher than the known TCOs, has its holes originating from a line structure, namely the breaking of dimers on the sulfur chain. The sulfur chain is optically inactive and serves purely to generate holes traveling in the Cu6S6 layers at finite temperature. This interesting hole-generating mechanism could open up new possibilities to achieve high hole conductivity in p-type TCs.

  20. DLTS of p-type Czochralski Si wafers containing processing-induced macropores

    NASA Astrophysics Data System (ADS)

    Simoen, E.; Depauw, V.; Gordon, I.; Poortmans, J.

    2012-01-01

    The deep levels present in p-type Czochralski silicon with processing-induced macropores in the depletion region have been studied by the deep-level transient (DLT) spectroscopy technique. It is shown that a broad band is present for a bias pulse close to the interface with the Al Schottky contact, which exhibits anomalously slow hole capture and is ascribed to the internal interface states of the macropores. For depths beyond the pore region, other deep levels, associated with point defects—possibly metal contamination during the high-temperature annealing step under H2 ambient--have been observed. The impact of the observed defects on the lifetime of thin-film solar cells, fabricated using macropore-based layer transfer is discussed. Finally, it is shown that the presence of pores in the depletion region, which also affects the DLT-spectrum, alters the capacitance-voltage characteristics.

  1. Reduced thermal conductivity due to scattering centers in p-type SiGe alloys

    NASA Technical Reports Server (NTRS)

    Beaty, John S.; Rolfe, Jonathon L.; Vandersande, Jan; Fleurial, Jean-Pierre

    1992-01-01

    Spark erosion was used to produce ultra-fine particles of SiGe thermoelectric material and boron nitride, an inert phonon-scattering material. A homogeneous powder was made by mixing the two powders. The mixture was hot pressed to produce a thermoelectric material with uniformity dispersed, ultra-fine, inert, phonon-scattering centers. It is shown that, in samples with inert boron nitride or silicon nitride, thermal conductivity of a SiGe alloy can be reduced by about 25 percent while maintaining the electrical properties of the samples. Annealing of all the samples at 1525 K caused grain growth to over a micron, eliminating the detrimental effect attributable to small grains. Only in the sample with boron nitride the thermal conductivity did remain well below that for standard p-type SiGe (about 25 percent), while the electrical resistivity and Seebeck coefficient were very close to the values for standard p-type 80/20 SiGe.

  2. Reduced thermal conductivity due to scattering centers in p-type SiGe alloys

    NASA Technical Reports Server (NTRS)

    Beaty, John S.; Rolfe, Jonathon L.; Vandersande, Jan; Fleurial, Jean-Pierre

    1992-01-01

    Spark erosion was used to produce ultra-fine particles of SiGe thermoelectric material and boron nitride, an inert phonon-scattering material. A homogeneous powder was made by mixing the two powders. The mixture was hot pressed to produce a thermoelectric material with uniformity dispersed, ultra-fine, inert, phonon-scattering centers. It is shown that, in samples with inert boron nitride or silicon nitride, thermal conductivity of a SiGe alloy can be reduced by about 25 percent while maintaining the electrical properties of the samples. Annealing of all the samples at 1525 K caused grain growth to over a micron, eliminating the detrimental effect attributable to small grains. Only in the sample with boron nitride the thermal conductivity did remain well below that for standard p-type SiGe (about 25 percent), while the electrical resistivity and Seebeck coefficient were very close to the values for standard p-type 80/20 SiGe.

  3. Quasi-perpetual discharge behaviour in p-type Ge-air batteries.

    PubMed

    Ocon, Joey D; Kim, Jin Won; Abrenica, Graniel Harne A; Lee, Jae Kwang; Lee, Jaeyoung

    2014-11-07

    Metal-air batteries continue to become attractive energy storage and conversion systems due to their high energy and power densities, safer chemistries, and economic viability. Semiconductor-air batteries - a term we first define here as metal-air batteries that use semiconductor anodes such as silicon (Si) and germanium (Ge) - have been introduced in recent years as new high-energy battery chemistries. In this paper, we describe the excellent doping-dependent discharge kinetics of p-type Ge anodes in a semiconductor-air cell employing a gelled KOH electrolyte. Owing to its Fermi level, n-type Ge is expected to have lower redox potential and better electronic conductivity, which could potentially lead to a higher operating voltage and better discharge kinetics. Nonetheless, discharge measurements demonstrated that this prediction is only valid at the low current regime and breaks down at the high current density region. The p-type Ge behaves extremely better at elevated currents, evident from the higher voltage, more power available, and larger practical energy density from a very long discharge time, possibly arising from the high overpotential for surface passivation. A primary semiconductor-air battery, powered by a flat p-type Ge as a multi-electron anode, exhibited an unprecedented full discharge capacity of 1302.5 mA h gGe(-1) (88% anode utilization efficiency), the highest among semiconductor-air cells, notably better than new metal-air cells with three-dimensional and nanostructured anodes, and at least two folds higher than commercial Zn-air and Al-air cells. We therefore suggest that this study be extended to doped-Si anodes, in order to pave the way for a deeper understanding on the discharge phenomena in alkaline metal-air conversion cells with semiconductor anodes for specific niche applications in the future.

  4. Total Ionizing Dose Radiation Effects in the P-Type Polycrystalline Silicon Thin Film Transistors

    NASA Astrophysics Data System (ADS)

    Liu, Yuan; Liu, Kai; Chen, Rong-Sheng; Liu, Yu-Rong; En, Yun-Fei; Li, Bin; Fang, Wen-Xiao

    2017-01-01

    Not Available Supported by the National Natural Science Foundation of China under Grant Nos 61574048 and 61204112, the Science and Technology Research Project of Guangdong Province under Grant Nos 2015B090912002 and 2014A030313656, and the Pearl River S&T Nova Program of Guangzhou.

  5. Thermal and electromechanical characterization of top-down fabricated p-type silicon nanowires

    NASA Astrophysics Data System (ADS)

    Bosseboeuf, Alain; Allain, Pierre Etienne; Parrain, Fabien; Le Roux, Xavier; Isac, Nathalie; Jacob, Serge; Poizat, Alexis; Coste, Philippe; Maaroufi, Seiffedine; Walther, Arnaud

    2015-01-01

    In this paper we report thermal conductivity and piezoresistivity measurements of top-down fabricated highly boron doped (NA = 1.5 × 1019 cm-3) suspended Si nanowires. These measurements were performed in a cryogenic probe station respectively by using the 3 omega method and by in situ application of a longitudinal tensile stress to the nanowire under test with a direct four point bending of the Si nanowire die. Nanowires investigated have a thickness of 160 nm, a width in the 80-260 nm range and a length in the 2.5-5.2 μm range. We found that for these geometries, thermal conduction still obeys Fourier’s law and that, as expected, the thermal conductivity is largely reduced when the nanowires width is shrunk, but, to a lower extent than published values for nanowires grown by vapor-liquid-solid (VLS) processes. While a large giant piezoresistance effect was evidenced by various authors when a static stress is applied, we only observed a limited nanowire size dependence of the piezoresistivity in our experiments where a dynamical mechanical loading is applied. This confirms that the giant piezoresistance effect in unbiased Si nanowires is not an intrinsic bulk effect but is dominated by surface related effects in agreement with the piezopinch effect model. Invited talk at the 7th International Workshop on Advanced Materials Science and Nanotechnology IWAMSN2014, 2-6 November, 2014, Ha Long, Vietnam

  6. Method and apparatus for stable silicon dioxide layers on silicon grown in silicon nitride ambient

    NASA Technical Reports Server (NTRS)

    Cohen, R. A.; Wheeler, R. K. (Inventor)

    1974-01-01

    A method and apparatus for thermally growing stable silicon dioxide layers on silicon is disclosed. A previously etched and baked silicon nitride tube placed in a furnace is used to grow the silicon dioxide. First, pure oxygen is allowed to flow through the tube to initially coat the inside surface of the tube with a thin layer of silicon dioxide. After the tube is coated with the thin layer of silicon dioxide, the silicon is oxidized thermally in a normal fashion. If the tube becomes contaminated, the silicon dioxide is etched off thereby exposing clean silicon nitride and then the inside of the tube is recoated with silicon dioxide. As is disclosed, the silicon nitride tube can also be used as the ambient for the pyrolytic decomposition of silane and ammonia to form thin layers of clean silicon nitride.

  7. Complementary X-ray and neutron radiography study of the initial lithiation process in lithium-ion batteries containing silicon electrodes

    NASA Astrophysics Data System (ADS)

    Sun, Fu; Markötter, Henning; Manke, Ingo; Hilger, André; Alrwashdeh, Saad S.; Kardjilov, Nikolay; Banhart, John

    2017-03-01

    Complementary in operando X-ray radiography and neutron radiography measurements were conducted to investigate and visualize the initial lithiation in silicon-electrode lithium-ion batteries. By means of X-ray radiography, a significant volume expansion of Si particles and the Si electrode during the first discharge was observed. In addition, many Si particles were found that never undergo electrochemical reactions. These findings were confirmed by neutron radiography, which, for the first time, showed the process of Li alloying with the Si electrode during initial lithiation. These results demonstrate that complementary X-ray and neutron radiography is a powerful tool to investigate the lithiation mechanisms inside Si-electrode based lithium-ion batteries.

  8. Bi-Se doped with Cu, p-type semiconductor

    DOEpatents

    Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

    2013-08-20

    A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

  9. P-type conductivity in annealed strontium titanate

    SciTech Connect

    Poole, Violet M.; Corolewski, Caleb D.; McCluskey, Matthew D.

    2015-12-15

    Hall-effect measurements indicate p-type conductivity in bulk, single-crystal strontium titanate (SrTiO{sub 3}, or STO) samples that were annealed at 1200°C. Room-temperature mobilities above 100 cm{sup 2}/V s were measured, an order of magnitude higher than those for electrons (5-10 cm{sup 2}/V s). Average hole densities were in the 10{sup 9}-10{sup 10} cm{sup −3} range, consistent with a deep acceptor.

  10. Microdistribution of oxygen in silicon

    NASA Technical Reports Server (NTRS)

    Murgai, A.; Chi, J. Y.; Gatos, H. C.

    1980-01-01

    The microdistribution of oxygen in Czochralskii-grown, p-type silicon crystals was determined by using the SEM in the EBIC mode in conjunction with spreading resistance measurements. When the conductivity remained p-type, bands of contrast were observed in the EBIC image which corresponded to maxima in resistivity. When at the oxygen concentration maxima the oxygen donor concentration exceeded the p-type dopant concentration, an inversion of the conductivity occurred. It resulted in the formation of p-n junctions in a striated configuration and the local inversion of the EBIC image contrast. By heat-treating silicon at 1000 C prior to the activation of oxygen donors, some silicon-oxygen micro-precipitates were observed in the EBIC image within the striated oxygen concentration maxima.

  11. Metal Fluoride Inhibition of a P-type H+ Pump

    PubMed Central

    Pedersen, Jesper Torbøl; Falhof, Janus; Ekberg, Kira; Buch-Pedersen, Morten Jeppe; Palmgren, Michael

    2015-01-01

    The plasma membrane H+-ATPase is a P-type ATPase responsible for establishing electrochemical gradients across the plasma membrane in fungi and plants. This essential proton pump exists in two activity states: an autoinhibited basal state with a low turnover rate and a low H+/ATP coupling ratio and an activated state in which ATP hydrolysis is tightly coupled to proton transport. Here we characterize metal fluorides as inhibitors of the fungal enzyme in both states. In contrast to findings for other P-type ATPases, inhibition of the plasma membrane H+-ATPase by metal fluorides was partly reversible, and the stability of the inhibition varied with the activation state. Thus, the stability of the ATPase inhibitor complex decreased significantly when the pump transitioned from the activated to the basal state, particularly when using beryllium fluoride, which mimics the bound phosphate in the E2P conformational state. Taken together, our results indicate that the phosphate bond of the phosphoenzyme intermediate of H+-ATPases is labile in the basal state, which may provide an explanation for the low H+/ATP coupling ratio of these pumps in the basal state. PMID:26134563

  12. Growth of P-type 4H-SiC single crystals by physical vapor transport using aluminum and nitrogen co-doping

    NASA Astrophysics Data System (ADS)

    Eto, Kazuma; Suo, Hiromasa; Kato, Tomohisa; Okumura, Hajime

    2017-07-01

    P-type 4H-silicon carbide (SiC) crystal growth has been achieved by physical vapor transport using aluminum and nitrogen co-doping. Aluminum carbide with a two-zone heating furnace was used for p-type doping, and yielded homogenous aluminum doping during SiC crystal growth by physical vapor transport. The 4H-SiC polytype with high-aluminum doping was unstable, but aluminum-nitrogen co-doping improved its stability. We grew p-type 4H-SiC bulk crystals of less than 90 mΩ cm by using co-doping. Secondary-ion mass spectrometry and Raman spectroscopy showed that the crystal growth of highly doped p-type SiC can be achieved by using the physical vapor transport method.

  13. Experiments with semiconducting p-type misfit compound

    NASA Astrophysics Data System (ADS)

    Heinonen, H.; Tervo, J.

    2012-06-01

    Ca3Co4O9 is a p-type semiconductor and a promising thermoelectric material with misfit layer structure. Cobalt-based layered structure materials have been studied as thermoelectric material candidates because of their nontoxicity, light weight, high thermal and chemical stability and oxidation resistance at high temperature. The operating area of Ca3Co4O9 in thermoelectric applications is roughly from 800K to 1000K. Ca3Co4O9 powders were synthetized by a sol-gel method which enables fabrication of high purity and homogeneous particles. Calcium and cobalt nitrate hydrates were used as feedstock and citric acid as complexing agent in the sol-gel procedure. Powders were calcinated at 1123K and further processing by ball milling. Pure Ca3Co4O9 powders were sintered by SPS and conventional method.

  14. What are the P-type Asteroids Made Of?

    NASA Technical Reports Server (NTRS)

    Hiroi, T.; Pieters, C. M.; Rutherford, M. J.; Zolensky, M. E.; Sasaki, S.; Ueda, Y.; Miyamoto, M.

    2004-01-01

    The P-type asteroids, together with the D asteroids, had been believed to be one of the most primitive asteroid classes having surface materials rich in carbon and/or organics. Upon a fall of a new type of meteorite, Tagish Lake in 2000, we came to have a possible sample of the D (and/or T) asteroids. In both spectrally and distance from the sun, the P asteroids are located in between the C/G/B/F asteroids and the D asteroids. Because it is believed that the former group are similar to (thermally metamorphosed) CI/CM chondrites and the latter the Tagish Lake meteorite, the surface material of the P asteroids may be understood in combination of those two meteorite groups. Taking that direction, this paper presents possibly the first quantitative characterization of the P asteroids in terms of carbonaceous chondrites and their experimental derivatives.

  15. Methods for enhancing P-type doping in III-V semiconductor films

    DOEpatents

    Liu, Feng; Stringfellow, Gerald; Zhu, Junyi

    2017-08-01

    Methods of doping a semiconductor film are provided. The methods comprise epitaxially growing the III-V semiconductor film in the presence of a dopant, a surfactant capable of acting as an electron reservoir, and hydrogen, under conditions that promote the formation of a III-V semiconductor film doped with the p-type dopant. In some embodiments of the methods, the epitaxial growth of the doped III-V semiconductor film is initiated at a first hydrogen partial pressure which is increased to a second hydrogen partial pressure during the epitaxial growth process.

  16. Influence of experimental parameters on physical properties of porous silicon and oxidized porous silicon layers

    NASA Astrophysics Data System (ADS)

    Charrier, J.; Alaiwan, V.; Pirasteh, P.; Najar, A.; Gadonna, M.

    2007-08-01

    This paper reports physical properties of porous silicon and oxidized porous silicon, manufactured by anodisation from heavily p-type doped silicon wafers as a function of experimental parameters. The growth rate and refractive index of the layers were studied at different applied current densities and glycerol concentrations in electrolyte. When the current density varied from 5 to 100 mA/cm 2, the refractive index was between 1.2 and 2.4 which corresponded to a porosity range from 42 to 85%. After oxidation, the porosity decreased and was between 2 and 45% for a refractive index range from 1.22 to 1.46. The thermal processing also induced an increase in thickness which was dependent on the initial porosity. This increase in thickness was more important for the lowest porosities. Lastly, the roughness of the porous layer/silicon substrate interface was studied at different applied current densities and glycerol concentrations in solution. Roughness decreased when the current density or glycerol concentration increased. Moreover, roughness was also reduced by thermal oxidation.

  17. Modeling of thin, back-wall silicon solar cells

    NASA Technical Reports Server (NTRS)

    Baraona, C. R.

    1979-01-01

    The performance of silicon solar cells with p-n junctions on the nonilluminated surface (i.e., upside-down or back-wall cells) was calculated. These structures consisted of a uniformly shaped p-type substrate layer, a p(+)-type field layer on the front (illuminated) surface, and a shallow, n-type junction on the back (nonilluminated) surface. A four-layer solar cell model was used to calculate efficiency, open-circuit voltage, and short-circuit current. The effect on performance of p-layer thickness and resistivity was determined. The diffusion length was varied to simulate the effect of radiation damage. The results show that peak initial efficiencies greater than 15 percent are possible for cell thicknesses or 100 micrometers or less. After 10 years of radiation damage in geosynchronous orbit, thin (25 to 50 micrometers thick) cells made from 10 to 100 ohm cm material show the smallest decrease (approximately 10 percent) in performance.

  18. Characterization of p-type ZnSe

    NASA Astrophysics Data System (ADS)

    Haase, M. A.; Cheng, H.; DePuydt, J. M.; Potts, J. E.

    1990-01-01

    Lithium-doped ZnSe has been grown on (100) GaAs by molecular beam epitaxy. The epitaxial layers are p-type with net acceptor concentrations (NA-ND) as high as 8×1016 cm-3— the highest ever reported for molecular beam epitaxial ZnSe. Room temperature ac measurements show resistivities as low as 2.9 Ω cm. Higher Li concentrations give rise to self-compensation and a decrease in NA-ND. The details of the electrical and optical characterization of these layers are presented. Rudimentary blue light emitting pn junction diodes have been fabricated. While these devices show dominant blue emission (463 nm) at room temperature, large turn-on voltages indicate that the p-ZnSe/p-GaAs interface presents a large barrier to hole transport. Moreover, we find that difficulty in making device-quality ohmic contacts to p-ZnSe is the next major obstacle to the fabrication of efficient blue light emitting diodes.

  19. Electronic processes in uniaxially stressed p-type germanium

    SciTech Connect

    Dubon, Jr., Oscar Danilo

    1996-02-01

    Effect of uniaxial stress on acceptor-related electronic processes in Ge single crystals doped with Ga, Be, and Cu were studied by Hall and photo-Hall effect measurements in conjunction with infrared spectroscopy. Stress dependence of hole lifetime in p-type Ge single crystals is used as a test for competing models of non-radiative capture of holes by acceptors. Photo-Hall effect shows that hole lifetime in Ga- and Be-doped Ge increases by over one order of magnitude with uniaxial stress at liq. He temps. Photo-Hall of Ge:Be shows a stress-induced change in the temperature dependence of hole lifetime. This is consistent with observed increase of responsivity of Ge:Ga detectors with uniaxial stress. Electronic properties of Ge:Cu are shown to change dramatically with uniaxial stress; the results provide a first explanation for the performance of uniaxially stressed, Cu-diffused Ge:Ga detectors which display a high conductivity in absence of photon signal and therefore have poor sensitivity.

  20. Challenges in p-type Doping of CdTe

    NASA Astrophysics Data System (ADS)

    McCoy, Jedidiah; Swain, Santosh; Lynn, Kelvin

    We have made progress in defect identification of arsenic and phosphorous doped CdTe to understand the self-compensation mechanism which will help improve minority bulk carrier lifetime and net acceptor density. Combining previous measurements of un-doped CdTe, we performed a systematic comparison of defects between different types of crystals and confirmed the defects impacting the doping efficiency. CdTe bulk crystals have been grown via vertical Bridgman based melt growth technique with varying arsenic and phosphorous dopant schemes to attain p-type material. Furnace temperature profiles were varied to influence dopant solubility. Large carrier densities have been reproducibly obtained from these boules indicating successful incorporation of dopants into the lattice. However, these values are orders of magnitude lower than theoretical solubility values. Infrared Microscopy has revealed a plethora of geometrically abnormal second phase defects and X-ray Fluorescence has been used to identify the elemental composition of these defects. We believe that dopants become incorporated into these second phase defects as Cd compounds which act to inhibit dopant solubility in the lattice.

  1. Stress effects on the initial lithiation of crystalline silicon nanowires: Reactive molecular dynamics simulations using ReaxFF

    DOE PAGES

    Ostadhossein, Alireza; Cubuk, Ekin D.; Tritsaris, Georgios A.; ...

    2014-12-18

    Silicon (Si) has been recognized as a promising anode material for the next-generation high-capacity lithium (Li)-ion batteries because of its high theoretical energy density. Recent in situ transmission electron microscopy (TEM) revealed that the electrochemical lithiation of crystalline Si nanowires (c-SiNWs) proceeds by the migration of the interface between the lithiated Si (LixSi) shell and the pristine unlithiated core, accompanied by solid-state amorphization. The underlying atomic mechanisms of Li insertion into c-Si remain poorly understood. In this research, we perform molecular dynamics (MD) simulations using the reactive force field (ReaxFF) to characterize the lithiation process of c-SiNWs. Our calculations showmore » that ReaxFF can accurately reproduce the energy barriers of Li migration from DFT calculations in both crystalline (c-Si) and amorphous Si (a-Si). The ReaxFF-based MD simulations reveal that Li insertion into interlayer spacing between two adjacent (111) planes results in the peeling-off of the (111) facets and subsequent amorphization, in agreement with experimental observations. We find that breaking of the Si–Si bonds between (111)-bilayers requires a rather high local Li concentration, which explains the atomically sharp amorphous–crystalline interface (ACI). Our stress analysis shows that lithiation induces compressive stress at the ACI layer, causing retardation or even the stagnation of the reaction front, also in good agreement with TEM observations. Lithiation at high temperatures (e.g. 1200 K) shows that Li insertion into c-SiNW results in an amorphous to crystalline phase transformation at Li : Si composition of ~4.2:1. In conclusion, our modeling results provide a comprehensive picture of the effects of reaction and diffusion-induced stress on the interfacial dynamics and mechanical degradation of SiNW anodes under chemo-mechanical lithiation.« less

  2. Stress effects on the initial lithiation of crystalline silicon nanowires: Reactive molecular dynamics simulations using ReaxFF

    SciTech Connect

    Ostadhossein, Alireza; Cubuk, Ekin D.; Tritsaris, Georgios A.; Kaxiras, Efthimios; Zhang, Sulin; Adri C. T. van Duin

    2014-12-18

    Silicon (Si) has been recognized as a promising anode material for the next-generation high-capacity lithium (Li)-ion batteries because of its high theoretical energy density. Recent in situ transmission electron microscopy (TEM) revealed that the electrochemical lithiation of crystalline Si nanowires (c-SiNWs) proceeds by the migration of the interface between the lithiated Si (LixSi) shell and the pristine unlithiated core, accompanied by solid-state amorphization. The underlying atomic mechanisms of Li insertion into c-Si remain poorly understood. In this research, we perform molecular dynamics (MD) simulations using the reactive force field (ReaxFF) to characterize the lithiation process of c-SiNWs. Our calculations show that ReaxFF can accurately reproduce the energy barriers of Li migration from DFT calculations in both crystalline (c-Si) and amorphous Si (a-Si). The ReaxFF-based MD simulations reveal that Li insertion into interlayer spacing between two adjacent (111) planes results in the peeling-off of the (111) facets and subsequent amorphization, in agreement with experimental observations. We find that breaking of the Si–Si bonds between (111)-bilayers requires a rather high local Li concentration, which explains the atomically sharp amorphous–crystalline interface (ACI). Our stress analysis shows that lithiation induces compressive stress at the ACI layer, causing retardation or even the stagnation of the reaction front, also in good agreement with TEM observations. Lithiation at high temperatures (e.g. 1200 K) shows that Li insertion into c-SiNW results in an amorphous to crystalline phase transformation at Li : Si composition of ~4.2:1. In conclusion, our modeling results provide a comprehensive picture of the effects of reaction and diffusion-induced stress on the interfacial dynamics and mechanical degradation of SiNW anodes under chemo-mechanical lithiation.

  3. P-type Ca2+ current in crayfish peptidergic neurones.

    PubMed

    GarcÍA-Colunga; Valdiosera; GarcÍA

    1999-01-21

    Inward Ca2+ current through voltage-gated Ca2+ channels was recorded from freshly dissociated crayfish X-organ (XO) neurones using the whole-cell voltage-clamp technique. Changing the holding potential from -50 to -90 mV had little effect on the characteristics of the current-voltage relationship: neither the time course nor the amplitude of the Ca2+ current was affected. Inactivation of the Ca2+ current was observed over a small voltage range, between -35 and -10 mV, with half-inactivation at -20 mV. The activation of the Ca2+ current was modelled using Hodgkin-Huxley kinetics. The time constant of activation, &tgr; m, was 568+/-66 micros at -20 mV and decreased gradually to 171+/-23 micros at 40 mV (means +/- s.e.m., N=5). The steady-state activation, m(infinity), was fitted with a Boltzmann function, with a half-activation voltage of -7.45 mV and an apparent threshold at -40 mV. The instantaneous current-voltage relationship was adjusted using the Goldman-Hodgkin-Katz constant-field equation, giving a permeation of 4.95x10(-5 )cm s-1. The inactivation of the Ca2+ current in XO neurones was dependent on previous entry of Ca2+. Using a double-pulse protocol, the inactivation was fitted to a U-shaped curve with a maximal inactivation of 35 % at 30 mV. The time course of the recovery from inactivation was fitted with an exponential function. The time constants were 17+/-2.6 ms for a prepulse of 10 ms and 31+/-3.2 ms for a prepulse of 20 ms. The permeability sequence of the Ca2+ channels was as follows: Ba2+>Sr2+~Ca2+>Mg2+. Other divalent cations blocked the Ca2+ current, and their effects were voltage-dependent; the potency of blockage was Cd2+~Zn2+>Co2+~Ni2+. The peptide &ohgr; -agatoxin-IVA, a selective toxin for P-type Ca2+ channels, blocked 85 % of the Ca2+ current in XO neurones at 200 nmol l-1, but the current was insensitive to dihydropyridines, phenylalkylamines, &ohgr; -conotoxin-GVIA and &ohgr; -conotoxin-MVIIC, which are blockers of L-, N- and Q-type Ca2

  4. Membrane Targeting of P-type ATPases in Plant Cells

    SciTech Connect

    Jeffrey F. Harper, Ph.D.

    2004-06-30

    How membrane proteins are targeted to specific subcellular locations is a very complex and poorly understood area of research. Our long-term goal is to use P-type ATPases (ion pumps), in a model plant system Arabidopsis, as a paradigm to understand how members of a family of closely related membrane proteins can be targeted to different subcellular locations. The research is divided into two specific aims. The first aim is focused on determining the targeting destination of all 10 ACA-type calcium pumps (Arabidopsis Calcium ATPase) in Arabidopsis. ACAs represent a plant specific-subfamily of plasma membrane-type calcium pumps. In contrast to animals, the plant homologs have been found in multiple membrane systems, including the ER (ACA2), tonoplast (ACA4) and plasma membrane (ACA8). Their high degree of similarity provides a unique opportunity to use a comparative approach to delineate the membrane specific targeting information for each pump. One hypothesis to be tested is that an endomembrane located ACA can be re-directed to the plasma membrane by including targeting information from a plasma membrane isoform, ACA8. Our approach is to engineer domain swaps between pumps and monitor the targeting of chimeric proteins in plant cells using a Green Fluorescence Protein (GFP) as a tag. The second aim is to test the hypothesis that heterologous transporters can be engineered into plants and targeted to the plasma membrane by fusing them to a plasma membrane proton pump. As a test case we are evaluating the targeting properties of fusions made between a yeast sodium/proton exchanger (Sod2) and a proton pump (AHA2). This fusion may potentially lead to a new strategy for engineering salt resistant plants. Together these aims are designed to provide fundamental insights into the biogenesis and function of plant cell membrane systems.

  5. Initial results of simultaneous PET/MRI experiments with an MRI-compatible silicon photomultiplier PET scanner.

    PubMed

    Yoon, Hyun Suk; Ko, Guen Bae; Kwon, Sun Il; Lee, Chan Mi; Ito, Mikiko; Chan Song, In; Lee, Dong Soo; Hong, Seong Jong; Lee, Jae Sung

    2012-04-01

    The most investigated semiconductor photosensor for MRI-compatible PET detectors is the avalanche photodiode (APD). However, the silicon photomultiplier (SiPM), also called the Geiger-mode APD, is gaining attention in the development of the next generation of PET/MRI systems because the SiPM has much better performance than the APD. We have developed an MRI-compatible PET system based on multichannel SiPM arrays to allow simultaneous PET/MRI. The SiPM PET scanner consists of 12 detector modules with a ring diameter of 13.6 cm and an axial extent of 3.2 cm. In each detector module, 4 multichannel SiPM arrays (with 4 × 4 channels arranged in a 2 × 2 array to yield 8 × 8 channels) were coupled with 20 × 18 Lu(1.9)Gd(0.1)SiO(5):Ce crystals (each crystal is 1.5 × 1.5 × 7 mm) and mounted on a charge division network for multiplexing 64 signals into 4 position signals. Each detector module was enclosed in a shielding box to reduce interference between the PET and MRI scanners, and the temperature inside the box was monitored for correction of the temperature-dependent gain variation of the SiPM. The PET detector signal was routed to the outside of the MRI room and processed with a field programmable gate array-based data acquisition system. MRI compatibility tests and simultaneous PET/MRI acquisitions were performed inside a 3-T clinical MRI system with 4-cm loop receiver coils that were built into the SiPM PET scanner. Interference between the imaging systems was investigated, and phantom and mouse experiments were performed. No radiofrequency interference on the PET signal or degradation in the energy spectrum and flood map was shown during simultaneous PET/MRI. The quality of the MRI scans acquired with and without the operating PET showed only slight degradation. The results of phantom and mouse experiments confirmed the feasibility of this system for simultaneous PET/MRI. Simultaneous PET/MRI was possible with a multichannel SiPM-based PET scanner, with no

  6. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating

    NASA Astrophysics Data System (ADS)

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-01

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  7. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating.

    PubMed

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-06-28

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors.

  8. Piezoresistive effect in p-type 3C-SiC at high temperatures characterized using Joule heating

    PubMed Central

    Phan, Hoang-Phuong; Dinh, Toan; Kozeki, Takahiro; Qamar, Afzaal; Namazu, Takahiro; Dimitrijev, Sima; Nguyen, Nam-Trung; Dao, Dzung Viet

    2016-01-01

    Cubic silicon carbide is a promising material for Micro Electro Mechanical Systems (MEMS) applications in harsh environ-ments and bioapplications thanks to its large band gap, chemical inertness, excellent corrosion tolerance and capability of growth on a Si substrate. This paper reports the piezoresistive effect of p-type single crystalline 3C-SiC characterized at high temperatures, using an in situ measurement method. The experimental results show that the highly doped p-type 3C-SiC possesses a relatively stable gauge factor of approximately 25 to 28 at temperatures varying from 300 K to 573 K. The in situ method proposed in this study also demonstrated that, the combination of the piezoresistive and thermoresistive effects can increase the gauge factor of p-type 3C-SiC to approximately 20% at 573 K. The increase in gauge factor based on the combination of these phenomena could enhance the sensitivity of SiC based MEMS mechanical sensors. PMID:27349378

  9. Orientation Effects in Ballistic High-Strained P-type Si Nanowire FETs

    PubMed Central

    Zhang, Jia-Hong; Huang, Qing-An; Yu, Hong; Lei, Shuang-Ying

    2009-01-01

    In order to design and optimize high-sensitivity silicon nanowire-field-effect transistor (SiNW FET) pressure sensors, this paper investigates the effects of channel orientations and the uniaxial stress on the ballistic hole transport properties of a strongly quantized SiNW FET placed near the high stress regions of the pressure sensors. A discrete stress-dependent six-band k.p method is used for subband structure calculation, coupled to a two-dimensional Poisson solver for electrostatics. A semi-classical ballistic FET model is then used to evaluate the ballistic current-voltage characteristics of SiNW FETs with and without strain. Our results presented here indicate that [110] is the optimum orientation for the p-type SiNW FETs and sensors. For the ultra-scaled 2.2 nm square SiNW, due to the limit of strong quantum confinement, the effect of the uniaxial stress on the magnitude of ballistic drive current is too small to be considered, except for the [100] orientation. However, for larger 5 nm square SiNW transistors with various transport orientations, the uniaxial tensile stress obviously alters the ballistic performance, while the uniaxial compressive stress slightly changes the ballistic hole current. Furthermore, the competition of injection velocity and carrier density related to the effective hole masses is found to play a critical role in determining the performance of the nanotransistors. PMID:22574043

  10. Orientation Effects in Ballistic High-Strained P-type Si Nanowire FETs.

    PubMed

    Zhang, Jia-Hong; Huang, Qing-An; Yu, Hong; Lei, Shuang-Ying

    2009-01-01

    In order to design and optimize high-sensitivity silicon nanowire-field-effect transistor (SiNW FET) pressure sensors, this paper investigates the effects of channel orientations and the uniaxial stress on the ballistic hole transport properties of a strongly quantized SiNW FET placed near the high stress regions of the pressure sensors. A discrete stress-dependent six-band k.p method is used for subband structure calculation, coupled to a two-dimensional Poisson solver for electrostatics. A semi-classical ballistic FET model is then used to evaluate the ballistic current-voltage characteristics of SiNW FETs with and without strain. Our results presented here indicate that [110] is the optimum orientation for the p-type SiNW FETs and sensors. For the ultra-scaled 2.2 nm square SiNW, due to the limit of strong quantum confinement, the effect of the uniaxial stress on the magnitude of ballistic drive current is too small to be considered, except for the [100] orientation. However, for larger 5 nm square SiNW transistors with various transport orientations, the uniaxial tensile stress obviously alters the ballistic performance, while the uniaxial compressive stress slightly changes the ballistic hole current. Furthermore, the competition of injection velocity and carrier density related to the effective hole masses is found to play a critical role in determining the performance of the nanotransistors.

  11. Microgravity silicon zoning investigation

    NASA Technical Reports Server (NTRS)

    Kern, E. L.; Gill, G. L., Jr.

    1983-01-01

    A resistance heated zoner, suitable for early zoning experiments with silicon, was designed and put into operation. The initial power usage and size was designed for an shown to be compatible with payload carriers contemplated for the Shuttle. This equipment will be used in the definition and development of flight experiments and apparatus for float zoning silicon and other materials in microgravity.

  12. Picosecond intersubband hole relaxation in p-type quantum wells

    SciTech Connect

    Xu, Z.; Fauchet, P.M.; Rella, C.W.; Schwettman, H.A.

    1995-12-31

    We report the first direct measurement of the relaxation time of holes in p-type quantum wells using tunable, subpicosecond mid-infrared laser pulses in a pump-probe arrangement. The QW layers consisted of 50 In{sub 0.5}Ga{sub 0.5}As/Al{sub 0.5}Ga{sub 0.5}As periods. The In{sub 0.5}Ga{sub 0.5}As well was 4 nm wide and the Al{sub 0.5}Ga{sub 0.5}As barrier was 8 nm wide. The dopant concentration was 10{sup 19} CM{sup -3} which corresponds to a sheet density of 1.2 x 10{sup 13} CM{sup -2}. The room temperature IR spectrum showed a 50 meV wide absorption peak at 5.25 {mu}m (220 meV). This energy agrees with the calculated n=1 heavy hole to n=1 light hole transition energy of 240 meV (150 meV for strain and 90 meV for confinement). The large absorption width results from hole-hole scattering and the difference in dispersion relations between the two subbands. The equal-wavelength pump-probe transmission measurements were performed using the Stanford free electron laser (FEL). The FEL pulses were tuned between 4 and 6 {mu} m and their duration was less than 1 ps. The measurements were performed as a function of temperature, pump wavelength and intensity (from 0.3 to 10 GW/cm{sup 2}). In all our experiments, we find an increase of transmission (decrease of absorption or bleaching) following photopumping, which recovers as a single exponential with a time constant (relaxation time) of the order of 1 picosecond. The maximum change in transmission is linear with pump 2 intensity below 1 GW/cm{sup 2} and saturates to {approximately}3% with a saturation intensity I{sub sat} of 3 GW/cm{sup 2}. As the saturation regime is entered, the relaxation time increases from 0.8 ps to 1.8 ps. This relaxation time depends on the temperature T: it increases from 0.8 ps to 1.3 ps as T decreases from 300 K to 77 K. Finally, when we tune the laser through the absorption band, the magnitude of the signal changes but its temporal behavior does not change, within the accuracy of the measurements.

  13. CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY: Excellent Passivation of p-Type Si Surface by Sol-Gel Al2O3 Films

    NASA Astrophysics Data System (ADS)

    Xiao, Hai-Qing; Zhou, Chun-Lan; Cao, Xiao-Ning; Wang, Wen-Jing; Zhao, Lei; Li, Hai-Ling; Diao, Hong-Wei

    2009-08-01

    Al2O3 films with a thickness of about 100 nm synthesized by spin coating and thermally treated are applied for field-induced surface passivation of p-type crystalline silicon. The level of surface passivation is determined by techniques based on photoconductance. An effective surface recombination velocity below 100 cm/s is obtained on 10Ω ·cm p-type c-Si wafers (Cz Si). A high density of negative fixed charges in the order of 1012 cm-2 is detected in the Al2O3 films and its impact on the level of surface passivation is demonstrated experimentally. Furthermore, a comparison between the surface passivation achieved for thermal SiO2 and plasma enhanced chemical vapor deposition SiNx:H films on the same c-Si is presented. The high negative fixed charge density explains the excellent passivation of p-type c-Si by Al2O3.

  14. Growth Of Delta-Doped Layer On Silicon CCD

    NASA Technical Reports Server (NTRS)

    Hoenk, Michael E.; Grunthaner, Paula J.; Grunthaner, Frank J.; Terhune, Robert W.; Hecht, Michael H.

    1995-01-01

    Response to ultraviolet light enhanced. Back-side-illuminated silicon charge-coupled device fabricated exhibiting nearly 100 percent internal quantum efficiency in near ultraviolet, by using molecular beam epitaxy to grow thin crystalline-silicon layer containing high concentration of boron (p-type dopant). By confining dopant atoms to one or few atomic layers in silicon lattice, concentration-vs.-depth profile made to resemble Dirac delta function, and resulting silicon layer said to be "delta-doped."

  15. Silicone metalization

    SciTech Connect

    Maghribi, Mariam N.; Krulevitch, Peter; Hamilton, Julie

    2008-12-09

    A system for providing metal features on silicone comprising providing a silicone layer on a matrix and providing a metal layer on the silicone layer. An electronic apparatus can be produced by the system. The electronic apparatus comprises a silicone body and metal features on the silicone body that provide an electronic device.

  16. Silicone metalization

    SciTech Connect

    Maghribi, Mariam N.; Krulevitch, Peter; Hamilton, Julie

    2006-12-05

    A system for providing metal features on silicone comprising providing a silicone layer on a matrix and providing a metal layer on the silicone layer. An electronic apparatus can be produced by the system. The electronic apparatus comprises a silicone body and metal features on the silicone body that provide an electronic device.

  17. Silicone metalization

    DOEpatents

    Maghribi, Mariam N.; Krulevitch, Peter; Hamilton, Julie

    2008-12-09

    A system for providing metal features on silicone comprising providing a silicone layer on a matrix and providing a metal layer on the silicone layer. An electronic apparatus can be produced by the system. The electronic apparatus comprises a silicone body and metal features on the silicone body that provide an electronic device.

  18. Silicon germanium carbon heteroepitaxial growth on silicon

    NASA Astrophysics Data System (ADS)

    Mayer, James W.

    1993-10-01

    This project represents the initiation of band-gap engineering of Si-based devices at Arizona State University by James W. Mayer. While at Cornell, he directed the Microscience and Technology program supported by the Semiconductor Research Corporation. His Work on heteoepitaxy of SiGe on silicon convinced him that heteroepitaxy on Si was a viable technique for forming smaller band gap layers on silicon but the requirement was for larger energy-gap materials. In the fall of 1991, James Mayer visited Tom Picraux of Sandia National Laboratories and Clarence Tracy of Motorola Semiconductor Products to discuss the possibility of a joint program to investigate Silicon Germanium Carbon Heteroepitaxial Growth on Silicon. This represented a new research and development initiate for band gap engineering.

  19. Ultrafast hole carrier relaxation dynamics in p-type CuO nanowires

    PubMed Central

    2011-01-01

    Ultrafast hole carrier relaxation dynamics in CuO nanowires have been investigated using transient absorption spectroscopy. Following femtosecond pulse excitation in a non-collinear pump-probe configuration, a combination of non-degenerate transmission and reflection measurements reveal initial ultrafast state filling dynamics independent of the probing photon energy. This behavior is attributed to the occupation of states by photo-generated carriers in the intrinsic hole region of the p-type CuO nanowires located near the top of the valence band. Intensity measurements indicate an upper fluence threshold of 40 μJ/cm2 where carrier relaxation is mainly governed by the hole dynamics. The fast relaxation of the photo-generated carriers was determined to follow a double exponential decay with time constants of 0.4 ps and 2.1 ps. Furthermore, time-correlated single photon counting measurements provide evidence of three exponential relaxation channels on the nanosecond timescale. PMID:22151927

  20. Piezoresistance and hole transport in beryllium-doped silicon.

    NASA Technical Reports Server (NTRS)

    Littlejohn, M. A.; Robertson, J. B.

    1972-01-01

    The resistivity and piezoresistance of p-type silicon doped with beryllium have been studied as a function of temperature, crystal orientation, and beryllium doping concentration. It is shown that the temperature coefficient of resistance can be varied and reduced to zero near room temperature by varying the beryllium doping level. Similarly, the magnitude of the piezoresistance gauge factor for beryllium-doped silicon is slightly larger than for silicon doped with a shallow acceptor impurity such as boron, while the temperature coefficient of piezoresistance is about the same for material containing these two dopants. These results are discussed in terms of a model for the piezoresistance of compensated p-type silicon.

  1. Ultraviolet light-emitting diodes with polarization-doped p-type layer

    NASA Astrophysics Data System (ADS)

    Hu, Wenxiao; Qin, Ping; Song, Weidong; Zhang, Chongzhen; Wang, Rupeng; Zhao, Liangliang; Xia, Chao; Yuan, Songyang; Yin, Yian; Li, Shuti

    2016-09-01

    We report ultraviolet light emitting diode (LEDs) with polarization doped p-type layer. Fabricated LEDs with polarization doped p-type layer exhibited reduced forward voltage and enhanced light output power, compared to those with traditional p-type AlGaN layer. The improvement is attributed to improved hole concentration and the smooth valence band by the polarization enhanced p-type doping. Our simulated results reveal that this p-type layer can further enhance the performance of ultraviolet LEDs by removing the electron blocking layer (EBL).

  2. Enhanced in-plane thermoelectric figure of merit in p-type SiGe thin films by nanograin boundaries

    NASA Astrophysics Data System (ADS)

    Lu, Jianbiao; Guo, Ruiqiang; Dai, Weijing; Huang, Baoling

    2015-04-01

    P-Type polycrystalline silicon-germanium (SiGe) thin films are grown by low-pressure chemical vapor deposition (LPCVD) and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling. The naturally formed grain boundaries are found to play a crucial role in determining both the charge and thermal transport properties of the films. Particularly, the grain boundaries create energy barriers for charge transport which lead to different dependences of charge mobility on doping concentration and temperature from the bulk counterparts. Meanwhile, the unique columnar grain structures result in remarkable thermal conductivity anisotropy with the in-plane thermal conductivities of SiGe films about 50% lower than the cross-plane values. By optimizing the growth conditions and doping level, a high in-plane figure of merit (ZT) of 0.2 for SiGe films is achieved at 300 K, which is about 100% higher than the previous record for p-type SiGe alloys, mainly due to the significant reduction in the in-plane thermal conductivity caused by nanograin boundaries. The low cost and excellent scalability of LPCVD render these high-performance SiGe films ideal candidates for thin-film thermoelectric applications.P-Type polycrystalline silicon-germanium (SiGe) thin films are grown by low-pressure chemical vapor deposition (LPCVD) and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling. The naturally formed grain boundaries are found to play a crucial role in determining both the charge and thermal transport properties of the films. Particularly, the grain boundaries create energy barriers for charge transport which lead to different dependences of charge mobility on doping concentration and temperature from the bulk counterparts. Meanwhile, the unique columnar grain structures result in remarkable thermal conductivity anisotropy with the in

  3. Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier

    DOEpatents

    Carlson, David E.; Wronski, Christopher R.

    1979-01-01

    A Schottky barrier amorphous silicon solar cell incorporating a thin highly doped p-type region of hydrogenated amorphous silicon disposed between a Schottky barrier high work function metal and the intrinsic region of hydrogenated amorphous silicon wherein said high work function metal and said thin highly doped p-type region forms a surface barrier junction with the intrinsic amorphous silicon layer. The thickness and concentration of p-type dopants in said p-type region are selected so that said p-type region is fully ionized by the Schottky barrier high work function metal. The thin highly doped p-type region has been found to increase the open circuit voltage and current of the photovoltaic device.

  4. Atomic scale investigation of silicon nanowires and nanoclusters

    PubMed Central

    2011-01-01

    In this study, we have performed nanoscale characterization of Si-clusters and Si-nanowires with a laser-assisted tomographic atom probe. Intrinsic and p-type silicon nanowires (SiNWs) are elaborated by chemical vapor deposition method using gold as catalyst, silane as silicon precursor, and diborane as dopant reactant. The concentration and distribution of impurity (gold) and dopant (boron) in SiNW are investigated and discussed. Silicon nanoclusters are produced by thermal annealing of silicon-rich silicon oxide and silica multilayers. In this process, atom probe tomography (APT) provides accurate information on the silicon nanoparticles and the chemistry of the nanolayers. PMID:21711788

  5. P-type Planet–Planet Scattering: Kepler Close Binary Configurations

    NASA Astrophysics Data System (ADS)

    Gong, Yan-Xiang

    2017-01-01

    A hydrodynamical simulation shows that a circumbinary planet will migrate inward to the edge of the disk cavity. If multiple planets form in a circumbinary disk, successive migration will lead to planet–planet scattering (PPS). PPS of Kepler-like circumbinary planets is discussed in this paper. The aim of this paper is to answer how PPS affects the formation of these planets. We find that a close binary has a significant influence on the scattering process. If PPS occurs near the unstable boundary of a binary, about 10% of the systems can be completely destroyed after PPS. In more than 90% of the systems, there is only one planet left. Unlike the eccentricity distribution produced by PPS in a single star system, the surviving planets generally have low eccentricities if PPS take place near the location of the currently found circumbinary planets. In addition, the ejected planets are generally the innermost of two initial planets. The above results depend on the initial positions of the two planets. If the initial positions of the planets are moved away from the binary, the evolution tends toward statistics similar to those around single stars. In this process, the competition between the planet–planet force and the planet-binary force makes the eccentricity distribution of surviving planets diverse. These new features of P-type PPS will deepen our understanding of the formation of these circumbinary planets.

  6. Porous silicon nanoparticle as a stabilizing support for chondroitinase.

    PubMed

    Daneshjou, Sara; Dabirmanesh, Bahareh; Rahimi, Fereshteh; Khajeh, Khosro

    2017-01-01

    Chondroitinase ABCI (cABCI) from Proteus vulgaris is a drug enzyme that can be used to treat spinal cord injuries. One of the main problems of chondroitinase ABC1 is its low thermal stability. The objective of the current study was to stabilize the enzyme through entrapment within porous silicon (pSi) nanoparticles. pSi was prepared by an electrochemical etch of p-type silicon using hydrofluoric acid/ethanol. The size of nanoparticles were determined 180nm by dynamic light scattering and the mean pore diameter was in the range of 40-60nm obtained by scanning electron microscopy. Enzymes were immobilized on porouse silicon nanoparticles by entrapment. The capacity of matrix was 35μg enzyme per 1mg of silicon. The immobilized enzyme displayed lower Vmax values compared to the free enzyme, but Km values were the same for both enzymes. Immobilization significantly increased the enzyme stability at various temperatures (-20, 4, 25 and 37°C). For example, at 4°C, the free enzyme (in 10mM imidazole) retained 20% of its activity after 100min, while the immobilized one retained 50% of its initial activity. Nanoparticles loading capacity and the enzyme release rate showed that the selected particles could be a pharmaceutically acceptable carrier for chondroitinase. Copyright © 2016 Elsevier B.V. All rights reserved.

  7. Nanocrystalline silicon/amorphous silicon dioxide superlattices

    SciTech Connect

    Fauchet, P.M.; Tsybeskov, L.; Zacharias, M. |; Hirschman, K. |

    1998-12-31

    Thin layers made of densely packed silicon nanocrystals sandwiched between amorphous silicon dioxide layers have been manufactured and characterized. An amorphous silicon/amorphous silicon dioxide superlattice is first grown by CVD or RF sputtering. The a-Si layers are recrystallized in a two-step procedure (nucleation + growth) for form layers of nearly identical nanocrystals whose diameter is given by the initial a-Si layer thickness. The recrystallization is monitored using a variety of techniques, including TEM, X-Ray, Raman, and luminescence spectroscopies. When the a-Si layer thickness decreases (from 25 nm to 2.5 nm) or the a-SiO{sub 2} layer thickness increases (from 1.5 nm to 6 nm), the recrystallization temperature increases dramatically compared to that of a single a-Si film. The removal of the a-Si tissue present between the nanocrystals, the passivation of the nanocrystals, and their doping are discussed.

  8. [Biological function of some elements and their compounds. IV. Silicon, silicon acids, silicones].

    PubMed

    Puzanowska-Tarasiewicz, Helena; Kuźmicka, Ludmiła; Tarasiewicz, Mirosław

    2009-11-01

    The review is devoted for the occurance, meaning of silicon and their compounds, especially silicon acids and silicones. Silicon participates in biosynthesis of collagen, the basic component of connective tissue. It strengthens and makes the walls of blood vessels more flexible, diminishes capillaries permeability, accelerates healing processes, has a sebostatic activity, strengthens hair and nails. This element has a beneficial effect on phosphorylation of proteins saccharides, and nucleotides. It is also essential for the formation of cytoskeleton and other cellular structures of mechanical or supportive function. Silicon is an initial substrate for obtaining silicones. These are synthetic polymers, in which silicon atoms are bound by oxygen bridges. They are used in almost all kinds of products due to their most convenient physical and chemical properties: moistening and film-forming, giving liquid form increasing solubility. Silicon acids form colloid gel, silica gel, with absorptive abilities, like active carbon.

  9. Capacitance transients in p-type GaAs MOS structures and application to lifetime mapping during solar cell fabrication

    NASA Technical Reports Server (NTRS)

    Vitale, G.; Loferski, J. J.; Ercil, Y.

    1979-01-01

    Fabrication on p-type GaAs of MOS structures in which the quality of the oxide is such that the surface can be driven into deep inversion by a voltage pulse is reported. The capacitance transients in such MOS capacitors as a function of step amplitude and temperature were measured and the transients were analyzed by an extension of a method for silicon. The oxides were produced by plasma oxidation on an LPE-grown p-type GaAs specimen with N sub A of 3x10 to the 17th power/cu cm. The capacitors were produced by depositing 50 microns-diameter gold dots over the native oxide and, therefore, the lifetime is localized to the area under the dot. The method permits extraction of both the bulk lifetime and the interface recombination velocity. These parameters on samples with different N sub A were measured and a correlation between tau sub g and N sub A was found.

  10. Photovoltaic Cell Having A P-Type Polycrystalline Layer With Large Crystals

    DOEpatents

    Albright, Scot P.; Chamberlin, Rhodes R.

    1996-03-26

    A photovoltaic cell has an n-type polycrystalline layer and a p-type polycrystalline layer adjoining the n-type polycrystalline layer to form a photovoltaic junction. The p-type polycrystalline layer comprises a substantially planar layer portion having relatively large crystals adjoining the n-type polycrystalline layer. The planar layer portion includes oxidized impurities which contribute to obtainment of p-type electrical properties in the planar layer portion.

  11. Fabrication and characterization of p-type SiNW/n-type ZnO heterostructure for optoelectronics application

    NASA Astrophysics Data System (ADS)

    Hazra, Purnima; Chakrabarti, P.; Jit, S.

    2015-02-01

    Semiconductor hybrid structure, known as core-shell heterostructures was fabricated and optical properties were analyzed to make it applicable in future optoelectronic and photonic devices. Large-area, high density, vertically oriented silicon nanowire arrays, synthesized by means of metal-assisted chemical etching of p-type silicon (100) substrate was used as the core and zinc oxide (ZnO) layer, deposited on the SiNW arrays by atomic layer deposition (ALD) was used as shell. The XRD peaks of the heterostructure confirmed the subsequent growth of ZnO film on the template of SiNW arrays having similar crystalline quality. The photoluminescence (PL) spectra showed a very sharp peak at 378 nm, corresponding to the band gap of ZnO material and another broad emission band almost throughout the entire visible range with a peak around 550 nm. The structure also showed a very good antireflection property. The results present that the SiNW/ZnO heterostructure can have potential application in future nanoscale electronic and photonic devices.

  12. Silicon production process evaluations

    NASA Technical Reports Server (NTRS)

    1982-01-01

    Engineering design of the third distillation column in the process was accomplished. The initial design is based on a 94.35% recovery of dichlorosilane in the distillate and a 99.9% recovery of trichlorosilane in the bottoms. The specified separation is achieved at a reflux ratio of 15 with 20 trays (equilibrium stages). Additional specifications and results are reported including equipment size, temperatures and pressure. Specific raw material requirements necessary to produce the silicon in the process are presented. The primary raw materials include metallurgical grade silicon, silicon tetrachloride, hydrogen, copper (catalyst) and lime (waste treatment). Hydrogen chloride is produced as by product in the silicon deposition. Cost analysis of the process was initiated during this reporting period.

  13. Photo-EMF sensitivity of porous silicon thin layer-crystalline silicon heterojunction to ammonia adsorption.

    PubMed

    Vashpanov, Yuriy; Jung, Jae Il; Kwack, Kae Dal

    2011-01-01

    A new method of using photo-electromotive force in detecting gas and controlling sensitivity is proposed. Photo-electromotive force on the heterojunction between porous silicon thin layer and crystalline silicon wafer depends on the concentration of ammonia in the measurement chamber. A porous silicon thin layer was formed by electrochemical etching on p-type silicon wafer. A gas and light transparent electrical contact was manufactured to this porous layer. Photo-EMF sensitivity corresponding to ammonia concentration in the range from 10 ppm to 1,000 ppm can be maximized by controlling the intensity of illumination light.

  14. Recombination mechanisms in amorphous silicon/crystalline silicon heterojunction solar cells

    NASA Astrophysics Data System (ADS)

    Jensen, N.; Rau, U.; Hausner, R. M.; Uppal, S.; Oberbeck, L.; Bergmann, R. B.; Werner, J. H.

    2000-03-01

    This article investigates limitations to the open circuit voltage of n-type amorphous silicon/p-type crystalline silicon heterojunction solar cells. The analysis of quantum efficiency and temperature dependent current/voltage characteristics identifies the dominant recombination mechanism. Depending on the electronic quality of the crystalline silicon absorber, either recombination in the neutral bulk or recombination in the space charge region prevails; recombination at the heterointerface is not relevant. Although interface recombination does not limit the open circuit voltage, recombination of photogenerated charge carriers at the heterointerface or in the amorphous silicon emitter diminishes the short circuit current of the solar cells.

  15. Photo-EMF Sensitivity of Porous Silicon Thin Layer–Crystalline Silicon Heterojunction to Ammonia Adsorption

    PubMed Central

    Vashpanov, Yuriy; Jung, Jae Il; Kwack, Kae Dal

    2011-01-01

    A new method of using photo-electromotive force in detecting gas and controlling sensitivity is proposed. Photo-electromotive force on the heterojunction between porous silicon thin layer and crystalline silicon wafer depends on the concentration of ammonia in the measurement chamber. A porous silicon thin layer was formed by electrochemical etching on p-type silicon wafer. A gas and light transparent electrical contact was manufactured to this porous layer. Photo-EMF sensitivity corresponding to ammonia concentration in the range from 10 ppm to 1,000 ppm can be maximized by controlling the intensity of illumination light. PMID:22319353

  16. Ultra-thin ohmic contacts for p-type nitride light emitting devices

    DOEpatents

    Raffetto, Mark [Raleigh, NC; Bharathan, Jayesh [Cary, NC; Haberern, Kevin [Cary, NC; Bergmann, Michael [Chapel Hill, NC; Emerson, David [Chapel Hill, NC; Ibbetson, James [Santa Barbara, CA; Li, Ting [Ventura, CA

    2012-01-03

    A semiconductor based Light Emitting Device (LED) can include a p-type nitride layer and a metal ohmic contact, on the p-type nitride layer. The metal ohmic contact can have an average thickness of less than about 25 .ANG. and a specific contact resistivity less than about 10.sup.-3 ohm-cm.sup.2.

  17. p-type Mesoscopic nickel oxide/organometallic perovskite heterojunction solar cells.

    PubMed

    Wang, Kuo-Chin; Jeng, Jun-Yuan; Shen, Po-Shen; Chang, Yu-Cheng; Diau, Eric Wei-Guang; Tsai, Cheng-Hung; Chao, Tzu-Yang; Hsu, Hsu-Cheng; Lin, Pei-Ying; Chen, Peter; Guo, Tzung-Fang; Wen, Ten-Chin

    2014-04-23

    In this article, we present a new paradigm for organometallic hybrid perovskite solar cell using NiO inorganic metal oxide nanocrystalline as p-type electrode material and realized the first mesoscopic NiO/perovskite/[6,6]-phenyl C61-butyric acid methyl ester (PC61BM) heterojunction photovoltaic device. The photo-induced transient absorption spectroscopy results verified that the architecture is an effective p-type sensitized junction, which is the first inorganic p-type, metal oxide contact material for perovskite-based solar cell. Power conversion efficiency of 9.51% was achieved under AM 1.5 G illumination, which significantly surpassed the reported conventional p-type dye-sensitized solar cells. The replacement of the organic hole transport materials by a p-type metal oxide has the advantages to provide robust device architecture for further development of all-inorganic perovskite-based thin-film solar cells and tandem photovoltaics.

  18. Luminance behavior of lithium-doped ZnO nanowires with p-type conduction characteristics.

    PubMed

    Ko, Won Bae; Lee, Jun Seok; Lee, Sang Hyo; Cha, Seung Nam; Sohn, Jung Inn; Kim, Jong Min; Park, Young Jun; Kim, Hyun Jung; Hong, Jin Pyo

    2013-09-01

    The present study describes the room-temperature cathodeluminescence (CL) and temperature-dependent photoluminescence (PL) properties of p-type lithium (Li)-doped zinc oxide (ZnO) nanowires (NWs) grown by hydrothermal doping and post-annealing processes. A ZnO thin film was used as a seed layer in NW growth. The emission wavelengths and intensities of undoped ZnO NWs and p-type Li-doped ZnO NWs were analyzed for comparison. CL and PL observations of post-annealed p-type Li-doped ZnO NWs clearly exhibited a dominant sharp band-edge emission. Finally, a n-type ZnO thin film/p-type annealed Li-doped ZnO NW homojunction diode was prepared to confirm the p-type conduction of annealed Li-doped ZnO NWs as well as the structural properties measured by transmission electron microscopy.

  19. p-type Mesoscopic Nickel Oxide/Organometallic Perovskite Heterojunction Solar Cells

    NASA Astrophysics Data System (ADS)

    Wang, Kuo-Chin; Jeng, Jun-Yuan; Shen, Po-Shen; Chang, Yu-Cheng; Diau, Eric Wei-Guang; Tsai, Cheng-Hung; Chao, Tzu-Yang; Hsu, Hsu-Cheng; Lin, Pei-Ying; Chen, Peter; Guo, Tzung-Fang; Wen, Ten-Chin

    2014-04-01

    In this article, we present a new paradigm for organometallic hybrid perovskite solar cell using NiO inorganic metal oxide nanocrystalline as p-type electrode material and realized the first mesoscopic NiO/perovskite/[6,6]-phenyl C61-butyric acid methyl ester (PC61BM) heterojunction photovoltaic device. The photo-induced transient absorption spectroscopy results verified that the architecture is an effective p-type sensitized junction, which is the first inorganic p-type, metal oxide contact material for perovskite-based solar cell. Power conversion efficiency of 9.51% was achieved under AM 1.5 G illumination, which significantly surpassed the reported conventional p-type dye-sensitized solar cells. The replacement of the organic hole transport materials by a p-type metal oxide has the advantages to provide robust device architecture for further development of all-inorganic perovskite-based thin-film solar cells and tandem photovoltaics.

  20. Theoretical study of hole initiated impact ionization in bulk silicon and GaAs using a wave-vector-dependent numerical transition rate formulation within an ensemble Monte Carlo calculation

    NASA Technical Reports Server (NTRS)

    Oguzman, Ismail H.; Wang, Yang; Kolnik, Jan; Brennan, Kevin F.

    1995-01-01

    In this paper, calculations of the hole initiated interband impact ionization rate in bulk silicon and GaAs are presented based on an ensemble Monte Carlo simulation with the inclusion of a wave-vector-dependent numerical transition rate formulation. The ionization transition rate is determined for each of the three valence bands, heavy, light, and split-off, using Fermi's golden rule with a two-body, screened Coulomb interaction. The dielectric function used within the calculation is assumed to be wave-vector-dependent. Calculations of the field-dependent impact ionization rate as well as the quantum yield are presented. It is found from both the quantum yield results and examination of the hole distribution function that the effective threshold energy for hole initiated impact ionization is relatively soft, similar to that predicted for the corresponding electron initiated ionization events occur more frequently than either heavy or split-offf initiated ionization events in bulk silicon over the applied electric field strengths examined here, 250-500 kV/cm. Conversely,in GaAs, the vast majority of hole initated ionization events originate from holes within the split-off band.

  1. Spectral sensitivity of graphene/silicon heterojunction photodetectors

    NASA Astrophysics Data System (ADS)

    Riazimehr, Sarah; Bablich, Andreas; Schneider, Daniel; Kataria, Satender; Passi, Vikram; Yim, Chanyoung; Duesberg, Georg S.; Lemme, Max C.

    2016-01-01

    We have studied the optical properties of two-dimensional (2D) Schottky photodiode heterojunctions made of chemical vapor deposited (CVD) graphene on n- and p-type silicon (Si) substrates. Much better rectification behavior is observed from the diodes fabricated on n-Si substrates in comparison with the devices on p-Si substrates in dark condition. Also, graphene - n-Si photodiodes show a considerable responsivity of 270 mA W-1 within the silicon spectral range in DC reverse bias condition. The present results are furthermore compared with that of a molybdenum disulfide (MoS2) - p-type silicon photodiode.

  2. Comparison of junctionless and inversion-mode p-type metal-oxide-semiconductor field-effect transistors in presence of hole-phonon interactions

    SciTech Connect

    Dib, E.; Carrillo-Nuñez, H.; Cavassilas, N.; Bescond, M.

    2016-01-28

    Junctionless transistors are being considered as one of the alternatives to conventional metal-oxide field-effect transistors. In this work, it is then presented a simulation study of silicon double-gated p-type junctionless transistors compared with its inversion-mode counterpart. The quantum transport problem is solved within the non-equilibrium Green's function formalism, whereas hole-phonon interactions are tackled by means of the self-consistent Born approximation. Our findings show that junctionless transistors should perform as good as a conventional transistor only for ultra-thin channels, with the disadvantage of requiring higher supply voltages in thicker channel configurations.

  3. The Fabrication, Microstructural Characterization, and Internal Photoresponse of Platinum Silicide/P-Type Silicon and Iridium Silicide/P-Type Silicon Schottky Barrier Photodetectors for Infrared Focal Plane Arrays

    DTIC Science & Technology

    1991-10-01

    the spectral region of interest. This fact has motivated studies of both the fundamental limitations governing Schottky detector performance and the...to suffer from this problem. In addition to the sort of fundamental obstacle just discussed, IrSi arrays have been beset by other difficulties...distribution function. 5.6 Diffusion theory may be derived from fundamental transport theory under the assumption that the diffusing particles undergo

  4. Process for making silicon

    NASA Technical Reports Server (NTRS)

    Levin, Harry (Inventor)

    1987-01-01

    A reactor apparatus (10) adapted for continuously producing molten, solar grade purity elemental silicon by thermal reaction of a suitable precursor gas, such as silane (SiH.sub.4), is disclosed. The reactor apparatus (10) includes an elongated reactor body (32) having graphite or carbon walls which are heated to a temperature exceeding the melting temperature of silicon. The precursor gas enters the reactor body (32) through an efficiently cooled inlet tube assembly (22) and a relatively thin carbon or graphite septum (44). The septum (44), being in contact on one side with the cooled inlet (22) and the heated interior of the reactor (32) on the other side, provides a sharp temperature gradient for the precursor gas entering the reactor (32) and renders the operation of the inlet tube assembly (22) substantially free of clogging. The precursor gas flows in the reactor (32) in a substantially smooth, substantially axial manner. Liquid silicon formed in the initial stages of the thermal reaction reacts with the graphite or carbon walls to provide a silicon carbide coating on the walls. The silicon carbide coated reactor is highly adapted for prolonged use for production of highly pure solar grade silicon. Liquid silicon (20) produced in the reactor apparatus (10) may be used directly in a Czochralski or other crystal shaping equipment.

  5. High performance p-type thermoelectric materials and methods of preparation

    NASA Technical Reports Server (NTRS)

    Caillat, Thierry (Inventor); Borshchevsky, Alexander (Inventor); Fleurial, Jean-Pierre (Inventor)

    2005-01-01

    The present invention is embodied in high performance p-type thermoelectric materials having enhanced thermoelectric properties and the methods of preparing such materials. In one aspect of the invention, p-type semiconductors of formula Zn4-xAxSb3-yBy wherein 0?x?4, A is a transition metal, B is a pnicogen, and 0?y?3 are formed for use in manufacturing thermoelectric devices with substantially enhanced operating characteristics and improved efficiency. Two methods of preparing p-type Zn4Sb3 and related alloys of the present invention include a crystal growth method and a powder metallurgy method.

  6. Characterization of p-type Hg1_xCdxTe by infrared reflectance

    NASA Astrophysics Data System (ADS)

    Baars, J.; Hurm, V.; Jakobus, T.; Seelewind, H.; Ziegler, J.

    1986-11-01

    An optical reflectance method is utilized to determine the effective acceptor concentra-tion of p-type Hgl_xCdxTe (o.2<= x<= 0.3). This method is based on the analysis of the spectral reflectance in the plasmon-phonon region of the samples at room temperature, and is capable of determining acceptor densities as low as 5.1015 cm-3. Experimental results of p-type bulk crystals and of p-type layers on n-type bulk crystals are presented, and the prac-tical limits of the method are discussed.

  7. Fabrication and Characterization of Nanoporous Energetic Silicon

    DTIC Science & Technology

    2008-12-01

    through wafer DRIE transfers the features to the wafer . The shadowmask is aligned to the nanoporous silicon wafer under a microscope, taped in place...bubbles on the surface of the silicon wafer during the etch, serving as a surfactant agent (Arrand, 1997). We begin with a > oriented, p-type...boron doped silicon wafer with 1-30 ohm-cm resistivity. Prior to the etch, a Ti/Pt layer of metal is deposited on the backside of the wafer to

  8. Origin of Photovoltage Enhancement via Interfacial Modification with Silver Nanoparticles Embedded in an a-SiC:H p-Type Layer in a-Si:H Solar Cells.

    PubMed

    Li, Tiantian; Zhang, Qixing; Ni, Jian; Huang, Qian; Zhang, Dekun; Li, Baozhang; Wei, Changchun; Yan, Baojie; Zhao, Ying; Zhang, Xiaodan

    2017-03-29

    We used silver nanoparticles (Ag-NPs) embedded in the p-type semiconductor layer of hydrogenated amorphous silicon (a-Si:H) solar cells in the Schottky barrier contact design to modify the interface between aluminum-doped ZnO (ZnO:Al, AZO) and p-type hydrogenated amorphous silicon carbide (p-a-SiC:H) without plasmonic absorption. The high work function of the Ag-NPs provided a good channel for the transport of photogenerated holes. A p-type nanocrystalline SiC:H layer was used to compensate for the real surface defects and voids on the surface of Ag-NPs to reduce recombination at the AZO/p-type layer interface, which then enhanced the photovoltage of single-junction a-Si:H solar cells to values as high as 1.01 V. The Ag-NPs were around 10 nm in diameter and thermally stable in the p-type a-SiC:H film at the solar-cell process temperature. We will also show that a wide range of photovoltages between 1.01 and 2.89 V could be obtained with single-, double-, and triple-junction solar cells based on the single-junction a-Si:H solar cells with tunable high photovoltage. These solar cells are suitable photocathodes for solar water-splitting applications.

  9. Distinctive features of boron distribution in silicon under high-dose ion-implantation doping

    SciTech Connect

    Galiev, G.B.; Saraikin, V.V.; Begishev, A.R.; Mokerov, V.G.

    1987-03-01

    The method of ion-implantation doping (IID) is used extensively in the fabrication of semiconductor devices as it allows different dopants to be introduced into a semiconductor in a controlled manner. The authors present their results of measurements of boron distribution profiles in silicon after IID, using secondary-ion mass spectroscopy (SIMS), and electroreflection spectroscopy. The authors studied samples of p/sup +/-p structures, where the p/sup +/ layer was obtained by IID of boron with different values of energy and dose into single-crystal silicon with an initial p-type carrier concentration of 1.6 x 10/sup 16/ cm/sup -3/ and (111) orientation.

  10. Opto-electrical properties of Sb-doped p-type ZnO nanowires

    NASA Astrophysics Data System (ADS)

    Kao, Tzu-Hsuan; Chen, Jui-Yuan; Chiu, Chung-Hua; Huang, Chun-Wei; Wu, Wen-Wei

    2014-03-01

    P-type ZnO nanowires (NWs) have attracted much attention in the past years due to the potential applications for optoelectronics and piezotronics. In this study, we have synthesized Sb-doped p-type ZnO NWs on Si (100) substrates by chemical vapor deposition with Aucatalyst. The Sb-doped ZnO NWs are single crystalline with high density, grown along [1-1-2] direction. The doping percentage of Sb is about 2.49%, which has been confirmed by X-ray photoelectron spectroscopy. The ZnO NW field effect transistor demonstrated its p-type characteristics. A high responsivity to ultraviolet photodetection was also observed. In addition, compared to intrinsic ZnO NWs, the conductivity of the Sb-doped ZnO NWs exhibited ˜2 orders of magnitude higher. These properties make the p-type ZnO NWs a promising candidate for electronic and optoelectronic devices.

  11. p-type behavior from Sb-doped ZnO heterojunction photodiodes

    NASA Astrophysics Data System (ADS)

    Mandalapu, L. J.; Xiu, F. X.; Yang, Z.; Zhao, D. T.; Liu, J. L.

    2006-03-01

    Antimony (Sb) doping was used to realize p-type ZnO films on n-Si (100) substrates by molecular beam epitaxy. These samples were fabricated into p-n heterojunction diodes. p-type behavior of Sb-doped ZnO was studied by carrying out I-V and capacitance-voltage (C-V ) measurements. I-V curves showed rectifying behavior similar to a p-type Schottky diode with a turn-on voltage around 2.4V, which is consistent with the Schottky barrier of about 2.2V obtained from C-V characterization. Good photoresponse in the UV region was obtained, which further proved that Sb doping could be used to fabricate p-type ZnO for photodetector and other optoelectronic applications.

  12. Opto-electrical properties of Sb-doped p-type ZnO nanowires

    SciTech Connect

    Kao, Tzu-Hsuan; Chen, Jui-Yuan; Chiu, Chung-Hua; Huang, Chun-Wei; Wu, Wen-Wei

    2014-03-17

    P-type ZnO nanowires (NWs) have attracted much attention in the past years due to the potential applications for optoelectronics and piezotronics. In this study, we have synthesized Sb-doped p-type ZnO NWs on Si (100) substrates by chemical vapor deposition with Aucatalyst. The Sb-doped ZnO NWs are single crystalline with high density, grown along [1-1-2] direction. The doping percentage of Sb is about 2.49%, which has been confirmed by X-ray photoelectron spectroscopy. The ZnO NW field effect transistor demonstrated its p-type characteristics. A high responsivity to ultraviolet photodetection was also observed. In addition, compared to intrinsic ZnO NWs, the conductivity of the Sb-doped ZnO NWs exhibited ∼2 orders of magnitude higher. These properties make the p-type ZnO NWs a promising candidate for electronic and optoelectronic devices.

  13. The Mobility, Resistivity and Carrier Density in p-Type Silicon Doped with Boron, Gallium and Indium.

    DTIC Science & Technology

    1979-08-01

    problem of the scattering of electrons by neutral hydogen atoms. The result is a temperature independent relaxation time given by 4; 37 Ti20tr 1N’ 1...collector diode. Mean values of resistivity, dopant density and Hall coefficient were determined by measuring five to eight selected test cells with a...a current regulated power supply (V-FR2503). The magnetic field strength was monitored by a Bell 620 gaussmeter with an STB4-0402 probe with a stated

  14. Develop Silicone Encapsulation Systems for Terrestrial Silicon Solar Arrays

    NASA Technical Reports Server (NTRS)

    1979-01-01

    The results for Task 3 of the Low Cost Solar Array Project are presented. Task 3 is directed toward the development of a cost effective encapsulating system for photovoltaic modules using silicon based materials. The technical approach of the contract effort is divided into four special tasks: (1) technology review; (2) generation of concepts for screening and processing silicon encapsulation systems; (3) assessment of encapsulation concepts; and (4) evaluation of encapsulation concepts. The candidate silicon materials are reviewed. The silicon and modified silicon resins were chosen on the basis of similarity to materials with known weatherability, cost, initial tangential modulus, accelerated dirt pick-up test results and the ratio of the content of organic phenyl substitution of methyl substitution on the backbone of the silicon resin.

  15. Effect of p-type multi-walled carbon nanotubes for improving hydrogen storage behaviors

    SciTech Connect

    Lee, Seul-Yi; Yop Rhee, Kyong; Nahm, Seung-Hoon; Park, Soo-Jin

    2014-02-15

    In this study, the hydrogen storage behaviors of p-type multi-walled carbon nanotubes (MWNTs) were investigated through the surface modification of MWNTs by immersing them in sulfuric acid (H{sub 2}SO{sub 4}) and hydrogen peroxide (H{sub 2}O{sub 2}) at various ratios. The presence of acceptor-functional groups on the p-type MWNT surfaces was confirmed by X-ray photoelectron spectroscopy. Measurement of the zeta-potential determined the surface charge transfer and dispersion of the p-type MWMTs, and the hydrogen storage capacity was evaluated at 77 K and 1 bar. From the results obtained, it was found that acceptor-functional groups were introduced onto the MWNT surfaces, and the dispersion of MWNTs could be improved depending on the acid-mixed treatment conditions. The hydrogen storage was increased by acid-mixed treatments of up to 0.36 wt% in the p-type MWNTs, compared with 0.18 wt% in the As-received MWNTs. Consequently, the hydrogen storage capacities were greatly influenced by the acceptor-functional groups of p-type MWNT surfaces, resulting in increased electron acceptor–donor interaction at the interfaces. - Graphical abstract: Hydrogen storage behaviors of the p-type MWNTs with the acid-mixed treatments are described. Display Omitted Display Omitted.

  16. Convergence of valence bands for high thermoelectric performance for p-type InN

    NASA Astrophysics Data System (ADS)

    Li, Hai-Zhu; Li, Ruo-Ping; Liu, Jun-Hui; Huang, Ming-Ju

    2015-12-01

    Band engineering to converge the bands to achieve high valley degeneracy is one of effective approaches for designing ideal thermoelectric materials. Convergence of many valleys in the valence band may lead to a high Seebeck coefficient, and induce promising thermoelectric performance of p-type InN. In the current work, we have systematically investigated the electronic structure and thermoelectric performance of wurtzite InN by using the density functional theory combined with semiclassical Boltzmann transport theory. Form the results, it can be found that intrinsic InN has a large Seebeck coefficient (254 μV/K) and the largest value of ZeT is 0.77. The transport properties of p-type InN are better than that of n-type one at the optimum carrier concentration, which mainly due to the large Seebeck coefficient for p-type InN, although the electrical conductivity of n-type InN is larger than that of p-type one. We found that the larger Seebeck coefficient for p-type InN may originate from the large valley degeneracy in the valence band. Moreover, the low minimum lattice thermal conductivity for InN is one key factor to become a good thermoelectric material. Therefore, p-type InN could be a potential material for further applications in the thermoelectric area.

  17. Indentation plasticity and fracture in silicon

    NASA Technical Reports Server (NTRS)

    Rybicki, George C.; Pirouz, P.

    1988-01-01

    Measurements of the ductile-brittle transition temperature of heavily doped silicon were carried out using indentation techniques. Diamond pyramid hardness tests were performed on the (100) face of heavily doped N-type and P-type and intrinsic silicon single crystals. Tests were performed over the range 200 C to 850 C and loads of 100 to 500 g were used. Samples were subsequently etched to reveal dislocation rosettes produced by indentation. Intrinsic silicon underwent a ductile-brittle transition at 660 C, P-type at 645 C and N-type at 625 C. Hardness values varied from 1.1 GPa at 700 C to 11.7 GPa at 200 C. Significant effects of hardness on doping were present only at the highest temperatures. Lower loads generally produced higher hardness but load did not affect the Ductile-Brittle Transition Temperature (DBTT). Fracture toughness values ranged from 0.9 MPa m(1/2) at 200 C to 2.75 MPa m(1/2) near the DBTT. Doping did not affect the fracture toughness of silicon. P-type doping increased the size of dislocation rosettes observed after indentation, but N-type did not, in contradiction of the expected results. Results are discussed in terms of the effect of doping on the dislocation mobility in silicon.

  18. Genomic Comparison of P-Type ATPase Ion Pumps in Arabidopsis and Rice1

    PubMed Central

    Baxter, Ivan; Tchieu, Jason; Sussman, Michael R.; Boutry, Marc; Palmgren, Michael G.; Gribskov, Michael; Harper, Jeffrey F.; Axelsen, Kristian B.

    2003-01-01

    Members of the P-type ATPase ion pump superfamily are found in all three branches of life. Forty-six P-type ATPase genes were identified in Arabidopsis, the largest number yet identified in any organism. The recent completion of two draft sequences of the rice (Oryza sativa) genome allows for comparison of the full complement of P-type ATPases in two different plant species. Here, we identify a similar number (43) in rice, despite the rice genome being more than three times the size of Arabidopsis. The similarly large families suggest that both dicots and monocots have evolved with a large preexisting repertoire of P-type ATPases. Both Arabidopsis and rice have representative members in all five major subfamilies of P-type ATPases: heavy-metal ATPases (P1B), Ca2+-ATPases (endoplasmic reticulum-type Ca2+-ATPase and autoinhibited Ca2+-ATPase, P2A and P2B), H+-ATPases (autoinhibited H+-ATPase, P3A), putative aminophospholipid ATPases (ALA, P4), and a branch with unknown specificity (P5). The close pairing of similar isoforms in rice and Arabidopsis suggests potential orthologous relationships for all 43 rice P-type ATPases. A phylogenetic comparison of protein sequences and intron positions indicates that the common angiosperm ancestor had at least 23 P-type ATPases. Although little is known about unique and common features of related pumps, clear differences between some members of the calcium pumps indicate that evolutionarily conserved clusters may distinguish pumps with either different subcellular locations or biochemical functions. PMID:12805592

  19. Improvement in thermoelectric power factor of mechanically alloyed p-type SiGe by incorporation of TiB{sub 2}

    SciTech Connect

    Ahmad, Sajid; Dubey, K.; Bhattacharya, Shovit; Basu, Ranita; Bhatt, Ranu; Bohra, A. K.; Singh, Ajay; Aswal, D. K.; Gupta, S. K.

    2016-05-23

    Nearly 60% of the world’s useful energy is wasted as heat and recovering a fraction of this waste heat by converting it as useful electrical power is an important area of research{sup [1]}. Thermoelectric power generators (TEG) are solid state devices which converts heat into electricity. TEG consists of n and p-type thermoelements connected electrically in series and thermally in parallel{sup [2]}. Silicon germanium (SiGe) alloy is one of the conventional high temperature thermoelectric materials and is being used in radio-isotopes based thermoelectric power generators for deep space exploration programs.Temperature (T) dependence of thermoelectric (TE) properties of p-type SiGe and p-type SiGe-x wt.%TiB{sub 2} (x=6,8,10%) nanocomposite materials has been studied with in the temperature range of 300 K to 1100 K. It is observed that there is an improvement in the power factor (α{sup 2}/ρ) of SiGe alloy on addition of TiB{sub 2} upto 8 wt.% that is mainly due to increase in the Seebeck coefficient (α) and electrical conductivity (σ) of the alloy.

  20. Growth of p-type GaAs/AlGaAs(111) quantum well infrared photodetector using solid source molecular-beam epitaxy

    SciTech Connect

    Li, H.; Mei, T.; Karunasiri, G.; Fan, W.J.; Zhang, D.H.; Yoon, S.F.; Yuan, K.H.

    2005-09-01

    A p-type GaAs/AlGaAs multi-quantum-well infrared photodetector (QWIP) was fabricated on a GaAs (111)A substrate by molecular-beam epitaxy using silicon as dopant. The same structure was also grown on a GaAs (100) wafer simultaneously to compare the material and structural properties. It was found that Si acts as a p-type dopant in the GaAs (111)A sample while it is n-type in the GaAs (100) counterpart. The growth rate was found to be appreciably enhanced for GaAs (111)A compared with that of GaAs (100) orientation, while the Al composition in the barriers was found to be 20% smaller for a (111) orientation which results in a smaller barrier height. A peak responsivity of 1 mA/W with a relatively wide wavelength response ({delta}{lambda}/{lambda}{sub p}{approx}53%) was observed for the GaAs (111)A QWIP, mainly due to the location of the excited state far above the barrier. The photoresponse also showed a relatively strong normal incident absorption probably originating from the mixing of the conduction and valence Bloch states. The optimization of the quantum well parameters should further enhance the responsivity of this p-type QWIP with Si as dopant species.

  1. Fabrication and electrical characterization of Al/DNA-CTMA/ p-type a-Si:H photodiode based on DNA-CTMA biomaterial

    NASA Astrophysics Data System (ADS)

    Siva Pratap Reddy, M.; Puneetha, Peddathimula; Lee, Young-Woong; Jeong, Seong-Hoon; Park, Chinho

    2017-01-01

    In this work, a deoxyribonucleic acid-cetyltrimethylammonium chloride (DNA-CTMA) biomaterial based p-type hydrogenated amorphous silicon ( a-Si:H) photodiode (PD) is fabricated and its electrical characteristics are investigated. The Al/DNA-CTMA/ p-type a-Si:H PD parameters are studied using current-voltage ( I-V), capacitancevoltage-frequency ( C-V-f) and conductance-voltage-frequency ( G/ω-V-f) measurements. The barrier height and the ideality factor of the diode are found to be 0.78 eV and 1.9, respectively. The electrical and photoconductivity properties of the diode are analyzed by using dark I-V and transient photocurrent techniques. The C-V-f and G/ω-V-f measurements indicate that the capacitance and conductance of the diode depend on the voltage and frequency, respectively. The experimental results reveal that the decreases in capacitance and the increases in conductance with an increase in frequency can be explained on the basis of interface states ( N SS ). Series resistance ( R S ) measurements are performed on the diode and discussed here. The obtained electrical parameters confirm that the Al/DNA-CTMA/ p-type a-Si:H PD can be used as an optical sensor for the development of commercial applications that are environmentally benign. [Figure not available: see fulltext.

  2. Low temperature coefficient of resistance and high gage factor in beryllium-doped silicon

    NASA Technical Reports Server (NTRS)

    Robertson, J. B.; Littlejohn, M. A.

    1974-01-01

    The gage factor and resistivity of p-type silicon doped with beryllium was studied as a function of temperature, crystal orientation, and beryllium doping concentration. It was shown that the temperature coefficient of resistance can be varied and reduced to zero near room temperature by varying the beryllium doping level. Similarly, the magnitude of the piezoresistance gage factor for beryllium-doped silicon is slightly larger than for silicon doped with a shallow acceptor impurity such as boron, whereas the temperature coefficient of piezoresistance is about the same for material containing these two dopants. These results are discussed in terms of a model for the piezoresistance of compensated p-type silicon.

  3. Segmentation of the Outer Contact on P-Type Coaxial Germanium Detectors

    SciTech Connect

    Hull, Ethan L.; Pehl, Richard H.; Lathrop, James R.; Martin, Gregory N.; Mashburn, R. B.; Miley, Harry S.; Aalseth, Craig E.; Hossbach, Todd W.

    2006-09-21

    Germanium detector arrays are needed for low-level counting facilities. The practical applications of such user facilities include characterization of low-level radioactive samples. In addition, the same detector arrays can also perform important fundamental physics measurements including the search for rare events like neutrino-less double-beta decay. Coaxial germanium detectors having segmented outer contacts will provide the next level of sensitivity improvement in low background measurements. The segmented outer detector contact allows performance of advanced pulse shape analysis measurements that provide additional background reduction. Currently, n-type (reverse electrode) germanium coaxial detectors are used whenever a segmented coaxial detector is needed because the outer boron (electron barrier) contact is thin and can be segmented. Coaxial detectors fabricated from p-type germanium cost less, have better resolution, and are larger than n-type coaxial detectors. However, it is difficult to reliably segment p-type coaxial detectors because thick (~1 mm) lithium-diffused (hole barrier) contacts are the standard outside contact for p-type coaxial detectors. During this Phase 1 Small Business Innovation Research (SBIR) we have researched the possibility of using amorphous germanium contacts as a thin outer contact of p-type coaxial detectors that can be segmented. We have developed amorphous germanium contacts that provide a very high hole barrier on small planar detectors. These easily segmented amorphous germanium contacts have been demonstrated to withstand several thousand volts/cm electric fields with no measurable leakage current (<1 pA) from charge injection over the hole barrier. We have also demonstrated that the contact can be sputter deposited around and over the curved outside surface of a small p-type coaxial detector. The amorphous contact has shown good rectification properties on the outside of a small p-type coaxial detector. These encouraging

  4. Chemical-free n-type and p-type multilayer-graphene transistors

    NASA Astrophysics Data System (ADS)

    Dissanayake, D. M. N. M.; Eisaman, M. D.

    2016-08-01

    A single-step doping method to fabricate n- and p-type multilayer graphene (MG) top-gate field effect transistors (GFETs) is demonstrated. The transistors are fabricated on soda-lime glass substrates, with the n-type doping of MG caused by the sodium in the substrate without the addition of external chemicals. Placing a hydrogen silsesquioxane (HSQ) barrier layer between the MG and the substrate blocks the n-doping, resulting in p-type doping of the MG above regions patterned with HSQ. The HSQ is deposited in a single fabrication step using electron beam lithography, allowing the patterning of arbitrary sub-micron spatial patterns of n- and p-type doping. When a MG channel is deposited partially on the barrier and partially on the glass substrate, a p-type and n-type doping profile is created, which is used for fabricating complementary transistors pairs. Unlike chemically doped GFETs in which the external dopants are typically introduced from the top, these substrate doped GFETs allow for a top gate which gives a stronger electrostatic coupling to the channel, reducing the operating gate bias. Overall, this method enables scalable fabrication of n- and p-type complementary top-gated GFETs with high spatial resolution for graphene microelectronic applications.

  5. Piezotronic effect in solution-grown p-type ZnO nanowires and films.

    PubMed

    Pradel, Ken C; Wu, Wenzhuo; Zhou, Yusheng; Wen, Xiaonan; Ding, Yong; Wang, Zhong Lin

    2013-06-12

    Investigating the piezotronic effect in p-type piezoelectric semiconductor is critical for developing a complete piezotronic theory and designing/fabricating novel piezotronic applications with more complex functionality. Using a low temperature solution method, we were able to produce ultralong (up to 60 μm in length) Sb doped p-type ZnO nanowires on both rigid and flexible substrates. For the p-type nanowire field effect transistor, the on/off ratio, threshold voltage, mobility, and carrier concentration of 0.2% Sb-doped sample are found to be 10(5), 2.1 V, 0.82 cm(2)·V(-1)·s(-1), and 2.6 × 10(17) cm(-3), respectively, and the corresponding values for 1% Sb doped samples are 10(4), 2.0 V, 1.24 cm(2)·V(-1)·s(-1), and 3.8 × 10(17) cm(-3). We further investigated the universality of piezotronic effect in the as-synthesized Sb-doped p-type ZnO NWs and reported for the first time strain-gated piezotronic transistors as well as piezopotential-driven mechanical energy harvesting based on solution-grown p-type ZnO NWs. The results presented here broaden the scope of piezotronics and extend the framework for its potential applications in electronics, optoelectronics, smart MEMS/NEMS, and human-machine interfacing.

  6. Formation of p-type ZnO thin film through co-implantation

    NASA Astrophysics Data System (ADS)

    Chuang, Yao-Teng; Liou, Jhe-Wei; Woon, Wei-Yen

    2017-01-01

    We present a study on the formation of p-type ZnO thin film through ion implantation. Group V dopants (N, P) with different ionic radii are implanted into chemical vapor deposition grown ZnO thin film on GaN/sapphire substrates prior to thermal activation. It is found that mono-doped ZnO by N+ implantation results in n-type conductivity under thermal activation. Dual-doped ZnO film with a N:P ion implantation dose ratio of 4:1 is found to be p-type under certain thermal activation conditions. Higher p-type activation levels (1019 cm-3) under a wider thermal activation range are found for the N/P dual-doped ZnO film co-implanted by additional oxygen ions. From high resolution x-ray diffraction and x-ray photoelectron spectroscopy it is concluded that the observed p-type conductivities are a result of the promoted formation of PZn-4NO complex defects via the concurrent substitution of nitrogen at oxygen sites and phosphorus at zinc sites. The enhanced solubility and stability of acceptor defects in oxygen co-implanted dual-doped ZnO film are related to the reduction of oxygen vacancy defects at the surface. Our study demonstrates the prospect of the formation of stable p-type ZnO film through co-implantation.

  7. Native p-type transparent conductive CuI via intrinsic defects

    NASA Astrophysics Data System (ADS)

    Wang, Jing; Li, Jingbo; Li, Shu-Shen

    2011-09-01

    The ability of CuI to be doped p-type via the introduction of native defects has been investigated using first-principles pseudopotential calculations based on density functional theory. The Cu vacancy has a lower formation energy than any of the other native defects, which include I vacancy (VI), Cu interstitial (Cui), I interstitial (Ii), Cu antisite (CuI), and I antisite (ICu). Combined with its shallow acceptor level, it offers sufficient hole concentrations in CuI. The natural band alignments as compared to zinc-blende ZnS, ZnSe, and ZnTe have also been calculated in order to further identify the p-type dopability of CuI. It is found that CuI has a relatively high valence band maximum and conduction band minimum, which also makes it easy to dope CuI p-type in terms of the doping limit rule. In addition, the small effective mass of the light hole—about 0.303m0—can provide high mobility and p-type conductivity in CuI. All of these results make CuI an ideal candidate for native p-type materials

  8. Chemical-free n-type and p-type multilayer-graphene transistors

    SciTech Connect

    Dissanayake, D. M. N. M.; Eisaman, M. D.

    2016-08-01

    A single-step doping method to fabricate n- and p-type multilayer graphene (MG) top-gate field effect transistors (GFETs) is demonstrated. The transistors are fabricated on soda-lime glass substrates, with the n-type doping of MG caused by the sodium in the substrate without the addition of external chemicals. Placing a hydrogen silsesquioxane (HSQ) barrier layer between the MG and the substrate blocks the n-doping, resulting in p-type doping of the MG above regions patterned with HSQ. The HSQ is deposited in a single fabrication step using electron beam lithography, allowing the patterning of arbitrary sub-micron spatial patterns of n- and p-type doping. When a MG channel is deposited partially on the barrier and partially on the glass substrate, a p-type and n-type doping profile is created, which is used for fabricating complementary transistors pairs. Unlike chemically doped GFETs in which the external dopants are typically introduced from the top, these substrate doped GFETs allow for a top gate which gives a stronger electrostatic coupling to the channel, reducing the operating gate bias. Overall, this method enables scalable fabrication of n- and p-type complementary top-gated GFETs with high spatial resolution for graphene microelectronic applications.

  9. p-type Mesoscopic Nickel Oxide/Organometallic Perovskite Heterojunction Solar Cells

    PubMed Central

    Wang, Kuo-Chin; Jeng, Jun-Yuan; Shen, Po-Shen; Chang, Yu-Cheng; Diau, Eric Wei-Guang; Tsai, Cheng-Hung; Chao, Tzu-Yang; Hsu, Hsu-Cheng; Lin, Pei-Ying; Chen, Peter; Guo, Tzung-Fang; Wen, Ten-Chin

    2014-01-01

    In this article, we present a new paradigm for organometallic hybrid perovskite solar cell using NiO inorganic metal oxide nanocrystalline as p-type electrode material and realized the first mesoscopic NiO/perovskite/[6,6]-phenyl C61-butyric acid methyl ester (PC61BM) heterojunction photovoltaic device. The photo-induced transient absorption spectroscopy results verified that the architecture is an effective p-type sensitized junction, which is the first inorganic p-type, metal oxide contact material for perovskite-based solar cell. Power conversion efficiency of 9.51% was achieved under AM 1.5 G illumination, which significantly surpassed the reported conventional p-type dye-sensitized solar cells. The replacement of the organic hole transport materials by a p-type metal oxide has the advantages to provide robust device architecture for further development of all-inorganic perovskite-based thin-film solar cells and tandem photovoltaics. PMID:24755642

  10. Nanoscale electro-structural characterisation of ohmic contacts formed on p-type implanted 4H-SiC.

    PubMed

    Frazzetto, Alessia; Giannazzo, Filippo; Lo Nigro, Raffaella; Di Franco, Salvatore; Bongiorno, Corrado; Saggio, Mario; Zanetti, Edoardo; Raineri, Vito; Roccaforte, Fabrizio

    2011-02-21

    This work reports a nanoscale electro-structural characterisation of Ti/Al ohmic contacts formed on p-type Al-implanted silicon carbide (4H-SiC). The morphological and the electrical properties of the Al-implanted layer, annealed at 1700°C with or without a protective capping layer, and of the ohmic contacts were studied using atomic force microscopy [AFM], transmission line model measurements and local current measurements performed with conductive AFM.The characteristics of the contacts were significantly affected by the roughness of the underlying SiC. In particular, the surface roughness of the Al-implanted SiC regions annealed at 1700°C could be strongly reduced using a protective carbon capping layer during annealing. This latter resulted in an improved surface morphology and specific contact resistance of the Ti/Al ohmic contacts formed on these regions. The microstructure of the contacts was monitored by X-ray diffraction analysis and a cross-sectional transmission electron microscopy, and correlated with the electrical results.

  11. Nanoscale electro-structural characterisation of ohmic contacts formed on p-type implanted 4H-SiC

    PubMed Central

    2011-01-01

    This work reports a nanoscale electro-structural characterisation of Ti/Al ohmic contacts formed on p-type Al-implanted silicon carbide (4H-SiC). The morphological and the electrical properties of the Al-implanted layer, annealed at 1700°C with or without a protective capping layer, and of the ohmic contacts were studied using atomic force microscopy [AFM], transmission line model measurements and local current measurements performed with conductive AFM. The characteristics of the contacts were significantly affected by the roughness of the underlying SiC. In particular, the surface roughness of the Al-implanted SiC regions annealed at 1700°C could be strongly reduced using a protective carbon capping layer during annealing. This latter resulted in an improved surface morphology and specific contact resistance of the Ti/Al ohmic contacts formed on these regions. The microstructure of the contacts was monitored by X-ray diffraction analysis and a cross-sectional transmission electron microscopy, and correlated with the electrical results. PMID:21711667

  12. Lithium-ion drifting: Application to the study of point defects in floating-zone silicon

    NASA Technical Reports Server (NTRS)

    Walton, J. T.; Wong, Y. K.; Zulehner, W.

    1997-01-01

    The use of lithium-ion (Li(+)) drifting to study the properties of point defects in p-type Floating-Zone (FZ) silicon crystals is reported. The Li(+) drift technique is used to detect the presence of vacancy-related defects (D defects) in certain p-type FZ silicon crystals. SUPREM-IV modeling suggests that the silicon point defect diffusivities are considerably higher than those commonly accepted, but are in reasonable agreement with values recently proposed. These results demonstrate the utility of Li(+) drifting in the study of silicon point defect properties in p-type FZ crystals. Finally, a straightforward measurement of the Li(+) compensation depth is shown to yield estimates of the vacancy-related defect concentration in p-type FZ crystals.

  13. Silicon-Rich Silicon Carbide Hole-Selective Rear Contacts for Crystalline-Silicon-Based Solar Cells.

    PubMed

    Nogay, Gizem; Stuckelberger, Josua; Wyss, Philippe; Jeangros, Quentin; Allebé, Christophe; Niquille, Xavier; Debrot, Fabien; Despeisse, Matthieu; Haug, Franz-Josef; Löper, Philipp; Ballif, Christophe

    2016-12-28

    The use of passivating contacts compatible with typical homojunction thermal processes is one of the most promising approaches to realizing high-efficiency silicon solar cells. In this work, we investigate an alternative rear-passivating contact targeting facile implementation to industrial p-type solar cells. The contact structure consists of a chemically grown thin silicon oxide layer, which is capped with a boron-doped silicon-rich silicon carbide [SiCx(p)] layer and then annealed at 800-900 °C. Transmission electron microscopy reveals that the thin chemical oxide layer disappears upon thermal annealing up to 900 °C, leading to degraded surface passivation. We interpret this in terms of a chemical reaction between carbon atoms in the SiCx(p) layer and the adjacent chemical oxide layer. To prevent this reaction, an intrinsic silicon interlayer was introduced between the chemical oxide and the SiCx(p) layer. We show that this intrinsic silicon interlayer is beneficial for surface passivation. Optimized passivation is obtained with a 10-nm-thick intrinsic silicon interlayer, yielding an emitter saturation current density of 17 fA cm(-2) on p-type wafers, which translates into an implied open-circuit voltage of 708 mV. The potential of the developed contact at the rear side is further investigated by realizing a proof-of-concept hybrid solar cell, featuring a heterojunction front-side contact made of intrinsic amorphous silicon and phosphorus-doped amorphous silicon. Even though the presented cells are limited by front-side reflection and front-side parasitic absorption, the obtained cell with a Voc of 694.7 mV, a FF of 79.1%, and an efficiency of 20.44% demonstrates the potential of the p(+)/p-wafer full-side-passivated rear-side scheme shown here.

  14. High performance P-type thermoelectric materials and methods of preparation

    NASA Technical Reports Server (NTRS)

    Caillat, Thierry (Inventor); Borshchevsky, Alexander (Inventor); Fleurial, Jean-Pierre (Inventor)

    2002-01-01

    The present invention is embodied in high performance p-type thermoelectric materials having enhanced thermoelectric properties and the methods of preparing such materials. In one aspect of the invention, p-type semiconductors of formula Zn.sub.4-x A.sub.x Sb.sub.3-y B.sub.y wherein 0.ltoreq.x.ltoreq.4, A is a transition metal, B is a pnicogen, and 0.ltoreq.y.ltoreq.3 are formed for use in manufacturing thermoelectric devices with substantially enhanced operating characteristics and improved efficiency. Two methods of preparing p-type Zn.sub.4 Sb.sub.3 and related alloys of the present invention include a crystal growth method and a powder metallurgy method.

  15. Identification and design principles of low hole effective mass p-type transparent conducting oxides

    PubMed Central

    Hautier, Geoffroy; Miglio, Anna; Ceder, Gerbrand; Rignanese, Gian-Marco; Gonze, Xavier

    2013-01-01

    The development of high-performance transparent conducting oxides is critical to many technologies from transparent electronics to solar cells. Whereas n-type transparent conducting oxides are present in many devices, their p-type counterparts are not largely commercialized, as they exhibit much lower carrier mobilities due to the large hole effective masses of most oxides. Here we conduct a high-throughput computational search on thousands of binary and ternary oxides and identify several highly promising compounds displaying exceptionally low hole effective masses (up to an order of magnitude lower than state-of-the-art p-type transparent conducting oxides), as well as wide band gaps. In addition to the discovery of specific compounds, the chemical rationalization of our findings opens new directions, beyond current Cu-based chemistries, for the design and development of future p-type transparent conducting oxides. PMID:23939205

  16. DyP-type peroxidases comprise a novel heme peroxidase family.

    PubMed

    Sugano, Y

    2009-04-01

    Dye-decolorizing peroxidase (DyP) is produced by a basidiomycete (Thanatephorus cucumeris Dec 1) and is a member of a novel heme peroxidase family (DyP-type peroxidase family) that appears to be distinct from general peroxidases. Thus far, 80 putative members of this family have been registered in the PeroxiBase database (http://peroxibase.isbsib.ch/) and more than 400 homologous proteins have been detected via PSI-BLAST search. Although few studies have characterized the function and structure of these proteins, they appear to be bifunctional enzymes with hydrolase or oxygenase, as well as typical peroxidase activities. DyP-type peroxidase family suggests an ancient root compared with other general peroxidases because of their widespread distribution in the living world. In this review, firstly, an outline of the characteristics of DyP from T. cucumeris is presented and then interesting characteristics of the DyP-type peroxidase family are discussed.

  17. Hydrogenated ZnO thin film with p-type surface conductivity from plasma treatment

    NASA Astrophysics Data System (ADS)

    Gurylev, V.; Useinov, A.; Hsieh, P. Y.; Su, C. Y.; Perng, T. P.

    2017-06-01

    Fabrication of a ZnO p-n homojunction within a single structure by a simple process is a challenging task. In this work, an intrinsic p-type surface conductive layer of ZnO with a controlled concentration of holes over n-type conductive bulk was obtained by a one-step room-temperature process via hydrogen plasma treatment. Non-contact surface sensitive techniques, such as Kelvin probe force microscopy and conductive force atomic microscopy, confirmed the existence of surface p-type conductivity through analyzing the distribution and concentration of charge carriers on the topmost surface of hydrogenated ZnO. A theoretical framework was constructed to provide a rationale of the p-type surface conductivity and justify its relation to the treatment time. It is believed that this finding will open a new possibility for the fabrication of ZnO based p-n junction devices.

  18. Preparation of p-type ZnMgO thin films by Sb doping method

    NASA Astrophysics Data System (ADS)

    Pan, X. H.; Ye, Z. Z.; Zeng, Y. J.; Gu, X. Q.; Li, J. S.; Zhu, L. P.; Zhao, B. H.; Che, Y.; Pan, X. Q.

    2007-07-01

    We report on Sb-doped p-type Zn0.95Mg0.05O thin films grown by pulsed laser deposition. The Sb-doped Zn0.95Mg0.05O films show an acceptable p-type conductivity with a resistivity of 126 Ω cm, a Hall mobility of 1.71 cm2 V-1 s-1 and a hole concentration of 2.90 × 1016 cm-3 at room temperature. Secondary ion mass spectroscopy confirms that Sb has been incorporated into the Zn0.95Mg0.05O films. Guided by x-ray photoemission spectroscopy analysis and a model for large-size-mismatched group-V dopants in ZnO, an SbZn-2VZn complex is believed to be the most possible acceptor in the Sb-doped p-type Zn0.95Mg0.05O thin films.

  19. Undoped p-type GaN1-xSbx alloys: Effects of annealing

    NASA Astrophysics Data System (ADS)

    Segercrantz, N.; Baumgartner, Y.; Ting, M.; Yu, K. M.; Mao, S. S.; Sarney, W. L.; Svensson, S. P.; Walukiewicz, W.

    2016-12-01

    We report p-type behavior for undoped GaN1-xSbx alloys with x ≥ 0.06 grown by molecular beam epitaxy at low temperatures (≤400 °C). Rapid thermal annealing of the GaN1-xSbx films at temperatures >400 °C is shown to generate hole concentrations greater than 1019 cm-3, an order of magnitude higher than typical p-type GaN achieved by Mg doping. The p-type conductivity is attributed to a large upward shift of the valence band edge resulting from the band anticrossing interaction between localized Sb levels and extended states of the host matrix.

  20. Metal electrode integration on macroporous silicon: pore distribution and morphology

    PubMed Central

    2012-01-01

    In this work, a new approach for the one-step integration of interdigitated electrodes on macroporous silicon substrates is presented. Titanium/gold interdigitated electrodes are used to pattern p-type silicon substrates prior the anodization in an organic electrolyte. The electrolyte characteristics, conductivity, and pH have been found to affect the adherence of the metal layer on the silicon surface during the electrochemical etching. The impact of the metal pattern on size distribution and morphology of the resulting macroporous silicon layer is analyzed. A formation mechanism supported by finite element simulation is proposed. PMID:22799456

  1. Carrier removal and defect behavior in p-type InP

    NASA Technical Reports Server (NTRS)

    Weinberg, I.; Swartz, C. K.; Drevinsky, P. J.

    1992-01-01

    A simple expression, obtained from the rate equation for defect production, was used to relate carrier removal to defect production and hole trapping rates in p-type InP after irradiation by 1-MeV electrons. Specific contributions to carrier removal from defect levels H3, H4, and H5 were determined from combined deep-level transient spectroscopy (DLTS) and measured carrier concentrations. An additional contribution was attributed to one or more defects not observed by the present DLTS measurements. The high trapping rate observed for H5 suggests that this defect, if present in relatively high concentration, could be dominant in p-type InP.

  2. Silicon spintronics.

    PubMed

    Jansen, Ron

    2012-04-23

    Worldwide efforts are underway to integrate semiconductors and magnetic materials, aiming to create a revolutionary and energy-efficient information technology in which digital data are encoded in the spin of electrons. Implementing spin functionality in silicon, the mainstream semiconductor, is vital to establish a spin-based electronics with potential to change information technology beyond imagination. Can silicon spintronics live up to the expectation? Remarkable advances in the creation and control of spin polarization in silicon suggest so. Here, I review the key developments and achievements, and describe the building blocks of silicon spintronics. Unexpected and puzzling results are discussed, and open issues and challenges identified. More surprises lie ahead as silicon spintronics comes of age.

  3. Platinum monolayer electrocatalyst on gold nanostructures on silicon for photoelectrochemical hydrogen evolution.

    PubMed

    Kye, Joohong; Shin, Muncheol; Lim, Bora; Jang, Jae-Won; Oh, Ilwhan; Hwang, Seongpil

    2013-07-23

    Pt monolayer decorated gold nanostructured film on planar p-type silicon is utilized for photoelectrochemical H2 generation in this work. First, gold nanostructured film on silicon was spontaneously produced by galvanic displacement of the reduction of gold ion and the oxidation of silicon in the presence of fluoride anion. Second, underpotential deposition (UPD) of copper under illumination produced Cu monolayer on gold nanostructured film followed by galvanic exchange of less-noble Cu monolayer with more-noble PtCl6(2-). Pt(shell)/Au(core) on p-type silicon showed the similar activity with platinum nanoparticle on silicon for photoelectrochemical hydrogen evolution reaction in spite of low platinum loading. From Tafel analysis, Pt(shell)/Au(core) electrocatalyst shows the higher area-specific activity than platinum nanoparticle on silicon demonstrating the significant role of underlying gold for charge transfer reaction from silicon to H(+) through platinum catalyst.

  4. A structural and functional perspective of DyP-type peroxidase family.

    PubMed

    Yoshida, Toru; Sugano, Yasushi

    2015-05-15

    Dye-decolorizing peroxidase from the basidiomycete Bjerkandera adusta Dec 1 (DyP) is a heme peroxidase. This name reflects its ability to degrade several anthraquinone dyes. The substrate specificity, the amino acid sequence, and the tertiary structure of DyP are different from those of the other heme peroxidase (super)families. Therefore, many proteins showing the similar amino acid sequences to that of DyP are called DyP-type peroxidase which is a new family of heme peroxidase identified in 2007. In fact, all structures of this family show a similar structure fold. However, this family includes many proteins whose amino acid sequence identity to DyP is lower than 15% and/or whose catalytic efficiency (kcat/Km) is a few orders of magnitude less than that of DyP. A protein showing an activity different from peroxidase activity (dechelatase activity) has been also reported. In addition, the precise physiological roles of DyP-type peroxidases are unknown. These facts raise a question of whether calling this family DyP-type peroxidase is suitable. Here, we review the differences and similarities of structure and function among this family and propose the reasonable new classification of DyP-type peroxidase family, that is, class P, I and V. In this contribution, we discuss the adequacy of this family name.

  5. Al/Ti contacts to Sb-doped p-type ZnO

    NASA Astrophysics Data System (ADS)

    Mandalapu, L. J.; Xiu, F. X.; Yang, Z.; Liu, J. L.

    2007-07-01

    Sb-doped p-type ZnO film was grown on Si (100) substrate by molecular-beam epitaxy. Al/Ti metal was evaporated on the ZnO film to form contacts. As-deposited contacts were Schottky with a barrier height of 0.8 eV. Ohmic conduction was achieved after thermal annealing. The different combinations of Ohmic and Schottky contacts on Sb-doped ZnO layer led to metal-semiconductor-metal (MSM), Schottky, and photoconductive devices. Ohmic contacts on Sb-doped p-type ZnO and backside of n-type Si substrate formed a heterojunction diode. MSM, Schottky, and photoconductor devices exhibited typical electrical characteristics, however, inverted rectification was observed for heterojunction diodes. All devices exhibited ultraviolet (UV) photoresponse. Secondary ion mass spectroscopy measurements were performed on the Ohmic and Schottky contacts on Sb-doped ZnO film to trace the metal profiles before and after annealing. Mechanisms of the formation of Schottky and Ohmic contacts to Sb-doped p-type ZnO and their device operation principles are discussed. This work suggests that Al/Ti can be used as both Ohmic and Schottky contacts to Sb-doped p-type ZnO for UV detection applications.

  6. P-type ZnO by Sb doping for PN-junction photodetectors

    NASA Astrophysics Data System (ADS)

    Liu, J. L.; Xiu, F. X.; Mandalapu, L. J.; Yang, Z.

    2006-02-01

    Sb-doped p-type ZnO films were grown on n-Si (100) by electron cyclotron resonance (ECR)-assisted molecular-beam epitaxy (MBE). Room temperature Hall effect measurements reveal that a heavily Sb-doped ZnO sample exhibits a low resistivity of 0.2 Ω cm, high hole concentration of 1.7×1018 cm -3, and high mobility of 20.0 cm2/V s. Low-temperature photoluminescence (PL) measurements show an Sb-associated acceptor-bound exciton (A °X) emission exists at 3.358 eV at 8.5 K. The acceptor energy level of the Sb dopant is estimated to be 0.14 eV above the valence band. Based on these electrical and optical properties, p-n hetero- and homojunction photodetectors employing Sb-doped p-type ZnO films were designed and fabricated. The heterojunction photodiode consists of Sb-doped p-type ZnO grown on n-Si (100) substrate. An Sb-doped p-type ZnO layer with an n-type Ga-doped ZnO layer was grown on a p-Si (111) substrate to form the homojunction. Current-Voltage (I-V) characterizations reveal rectifying characteristics. Good photoresponse to UV light has been demonstrated for both hetero and homojunction photodetectors.

  7. Quantifying the Performance of P-Type Transparent Conducting Oxides by Experimental Methods.

    PubMed

    Fleischer, Karsten; Norton, Emma; Mullarkey, Daragh; Caffrey, David; Shvets, Igor V

    2017-09-01

    Screening for potential new materials with experimental and theoretical methods has led to the discovery of many promising candidate materials for p-type transparent conducting oxides. It is difficult to reliably assess a good p-type transparent conducting oxide (TCO) from limited information available at an early experimental stage. In this paper we discuss the influence of sample thickness on simple transmission measurements and how the sample thickness can skew the commonly used figure of merit of TCOs and their estimated band gap. We discuss this using copper-deficient CuCrO 2 as an example, as it was already shown to be a good p-type TCO grown at low temperatures. We outline a modified figure of merit reducing thickness-dependent errors, as well as how modern ab initio screening methods can be used to augment experimental methods to assess new materials for potential applications as p-type TCOs, p-channel transparent thin film transistors, and selective contacts in solar cells.

  8. Room temperature deposited oxide p-n junction using p-type zinc-cobalt-oxide

    NASA Astrophysics Data System (ADS)

    Kim, SeonHoo; Cianfrone, J. A.; Sadik, P.; Kim, K.-W.; Ivill, M.; Norton, D. P.

    2010-05-01

    Oxide semiconductors are attractive materials for thin-film electronics and optoelectronics due to compatibility with synthesis on large-area, inexpensive glass and flexible plastic substrate. However, development of thin-film electronics has been hampered by the limited number of semiconducting oxides that are p-type. Here, we report on the properties of zinc-cobalt-oxide (Zn-Co-O) films, deposited at room temperature using pulsed laser deposition, that exhibit p-type conduction. Films are deposited at room temperature in a background of oxygen using a polycrystalline ZnCo2O4 ablation target. The p-type conduction is confirmed by positive Seebeck coefficient and positive Hall coefficient. Both electrical resistivity and carrier density are dependent on oxygen background pressure used during deposition. Zn-Co-O films deposited in 50 mTorr oxygen pressure appear to be amorphous based on x-ray diffraction, and show an electrical conductivity as high as 21 S cm-1. Distinct rectifying current-voltage characteristics are observed for junctions between Zn-Co-O and n-type InGaZnO films, exhibiting a threshold voltage of ˜2.5 V. P-type Zn-Co-O appears promising for thin-film electronic device technology.

  9. Intrinsic p-type W-based transition metal dichalcogenide by substitutional Ta-doping

    NASA Astrophysics Data System (ADS)

    Fu, Yajun; Long, Mingsheng; Gao, Anyuan; Wang, Yu; Pan, Chen; Liu, Xiaowei; Zeng, Junwen; Xu, Kang; Zhang, Lili; Liu, Erfu; Hu, Weida; Wang, Xiaomu; Miao, Feng

    2017-07-01

    Two-dimensional (2D) transition metal dichalcogenides (TMDs) have recently emerged as promising candidates for future electronics and optoelectronics. While most of TMDs are intrinsic n-type semiconductors due to electron donating which originates from chalcogen vacancies, obtaining intrinsic high-quality p-type semiconducting TMDs has been challenging. Here, we report an experimental approach to obtain intrinsic p-type Tungsten (W)-based TMDs by substitutional Ta-doping. The obtained few-layer Ta-doped WSe2 (Ta0.01W0.99Se2) field-effect transistor devices exhibit competitive p-type performances, including ˜106 current on/off at room temperature. We also demonstrate high quality van der Waals (vdW) p-n heterojunctions based on Ta0.01W0.99Se2/MoS2 structure, which exhibit nearly ideal diode characteristics (with an ideality factor approaching 1 and a rectification ratio up to 1 × 105) and excellent photodetecting performance. Our study suggests that substitutional Ta-doping holds great promise to realize intrinsic p-type W-based TMDs for future electronic and photonic applications.

  10. Relative Frequencies of G and P Types among Rotaviruses from Indian Diarrheic Cow and Buffalo Calves

    PubMed Central

    Gulati, Baldev R.; Nakagomi, Osamu; Koshimura, Yumi; Nakagomi, Toyoko; Pandey, Ramayan

    1999-01-01

    While an increasing number of studies suggest that there is a high prevalence of rotaviruses with P8[11], a typical P type of bovine rotavirus (BRV), among human neonates or infants in India, no data are available on the distribution of G and P types of Indian BRVs. Thus, fecal specimens were collected from cow and buffalo calves under 1 month of age on organized dairy farms in India during the period between 1994 and 1997, and 36 rotavirus-positive specimens were used to determine the relative frequencies of the G and P types of Indian BRVs. As to the G type, G10 was predominant (83%), followed by G6 (6%). The majority (94%) of BRVs had P8[11], and only one isolate possessed P6[1]. The most common combination of G and P types was G10P8[11] (81%), followed by G6P6[1] (3%) and G6P8[11] (3%). The high prevalence of BRVs possessing P8[11] VP4s strongly supports the hypothesis that BRVs may cross the host species barrier and circulate among neonates in India. PMID:10325385

  11. Characterization of a novel DyP-type peroxidase from Streptomyces avermitilis.

    PubMed

    Sugawara, Kanako; Nishihashi, Yuriko; Narioka, Tomomi; Yoshida, Toru; Morita, Mifumi; Sugano, Yasushi

    2017-04-01

    DyP-type peroxidases are a heme peroxidase family with unique properties whose members are widely distributed from prokaryotes to eukaryotes. DyP-type peroxidases are subdivided into class P, I and V based on structure-based sequence alignment. Class V enzymes possess degradation activities for anthraquinone dyes, and include extra sequences compared with class P and I. Class V enzymes are mainly found in fungi, with only two such proteins, AnaPX and DyP2, reported in bacteria. Here, we heterologously expressed, purified and biochemically characterized SaDyP2 protein, predicted to belong to class V. SaDyP2 was purified as a ∼50 kDa enzyme containing a heme cofactor and was found to oxidize the typical peroxidase substrates, ABTS and DMP. SaDyP2 was generally thermostable and exhibited a lower optimal pH, a feature typical of DyP-type peroxidases. It also degraded anthraquinone dyes, a specific substrate of DyP-type peroxidases, although the kcat for SaDyP2 was lower than that for other class V enzymes. The Km value of SaDyP2 for anthraquinone dye was similar to that of other enzymes of this class. Homology modeling revealed that the structure of SaDyP2 best fit that of class V enzymes. Copyright © 2017 The Society for Biotechnology, Japan. Published by Elsevier B.V. All rights reserved.

  12. Origin and evolution of metal P-type ATPases in Plantae (Archaeplastida)

    PubMed Central

    Hanikenne, Marc; Baurain, Denis

    2013-01-01

    Metal ATPases are a subfamily of P-type ATPases involved in the transport of metal cations across biological membranes. They all share an architecture featuring eight transmembrane domains in pairs of two and are found in prokaryotes as well as in a variety of Eukaryotes. In Arabidopsis thaliana, eight metal P-type ATPases have been described, four being specific to copper transport and four displaying a broader metal specificity, including zinc, cadmium, and possibly copper and calcium. So far, few efforts have been devoted to elucidating the origin and evolution of these proteins in Eukaryotes. In this work, we use large-scale phylogenetics to show that metal P-type ATPases form a homogenous group among P-type ATPases and that their specialization into either monovalent (Cu) or divalent (Zn, Cd…) metal transport stems from a gene duplication that took place early in the evolution of Life. Then, we demonstrate that the four subgroups of plant metal ATPases all have a different evolutionary origin and a specific taxonomic distribution, only one tracing back to the cyanobacterial progenitor of the chloroplast. Finally, we examine the subsequent evolution of these proteins in green plants and conclude that the genes thoroughly characterized in model organisms are often the result of lineage-specific gene duplications, which calls for caution when attempting to infer function from sequence similarity alone in non-model organisms. PMID:24575101

  13. Semiconductor liquid junction photocell having a p-type photoactive electrode

    SciTech Connect

    Heller, A.; Lewerenz, H.J.; Miller, B.

    1982-08-10

    A semiconductor liquid junction photocell has a photovoltaic junction between a p-type photoactive electrode comprising InP or Si and an electrolyte comprising a redox couple selected from the group consisting of V2+/V3+, Nb4+/Nb5+, and Ti3+/Ti4+ produces a stable photocurrent output.

  14. Surface enhanced resonance Raman detection of a catalytic intermediate of DyP-type peroxidase.

    PubMed

    Todorovic, Smilja; Hildebrandt, Peter; Martins, Lígia O

    2015-05-14

    We report herein the vibrational spectroscopic characterisation of a catalytic intermediate formed by the reaction of H2O2 with DyP-type peroxidase immobilised on a biocompatible coated metal support. The SERR spectroscopic approach is of general applicability to other peroxidases which form relatively stable catalytic intermediates.

  15. Pure silver ohmic contacts to N- and P- type gallium arsenide materials

    DOEpatents

    Hogan, Stephen J.

    1986-01-01

    Disclosed is an improved process for manufacturing gallium arsenide semiconductor devices having as its components an n-type gallium arsenide substrate layer and a p-type gallium arsenide diffused layer. The improved process comprises forming a pure silver ohmic contact to both the diffused layer and the substrate layer, wherein the n-type layer comprises a substantially low doping carrier concentration.

  16. Process for forming pure silver ohmic contacts to N- and P-type gallium arsenide materials

    DOEpatents

    Hogan, S.J.

    1983-03-13

    Disclosed is an improved process for manufacturing gallium arsenide semiconductor devices having as its components a n-type gallium arsenide substrate layer and a p-type gallium arsenide diffused layer. The improved process comprises forming a pure silver ohmic contact to both the diffuse layer and the substrate layer wherein the n-type layer comprises a substantially low doping carrier concentration.

  17. Synthesis and characterization of silicon nanowire arrays for photovoltaic applications

    NASA Astrophysics Data System (ADS)

    Eichfeld, Sarah M.

    The overall objective of this thesis was the development of processes for the fabrication of radial p-n silicon nanowires (SiNWs) using bottom-up nanowire growth techniques on silicon and glass substrates. Vapor-liquid-solid (VLS) growth was carried out on Si(111) substrates using SiCl4 as the silicon precursor. Growth conditions including temperature, PSiCl4, PH2, and position were investigated to determine the optimum growth conditions for epitaxially oriented silicon nanowire arrays. The experiments revealed that the growth rate of the silicon nanowires exhibits a maximum as a function of PSiCl4 and P H2. Gas phase equilibrium calculations were used in conjunction with a mass transport model to explain the experimental data. The modeling results demonstrate a similar maximum in the mass of solid silicon predicted to form as a function of PSiCl4 and PH2, which results from a change in the gas phase concentration of SiHxCly and SiClx species. This results in a shift in the process from growth to etching with increasing PSiCl4. In general, for the atmospheric pressure conditions employed in this study, growth at higher temperatures >1000°C and higher SiCl4 concentrations gave the best results. The growth of silicon nanowire arrays on anodized alumina (AAO)-coated glass substrates was also investigated. Glass will not hold up to the high temperatures required for Si nanowire growth with SiCl4 so SiH 4 was used as the Si precursor instead. Initial studies were carried out to measure the resistivity of p-type and n-type silicon nanowires grown in freestanding AAO membranes. A series of nanowire samples were grown in which the doping and the nanowire length inside the membrane were varied. Circular metal contacts were deposited on the top surface of the membranes and the resistance of the nanowire arrays was measured. The measured resistance versus nanowire length was plotted and the nanowire resistivity was extracted from the slope. The resistivity of the silicon

  18. Friction and Wear Behavior of Silicon Under Conditions of Sliding.

    NASA Astrophysics Data System (ADS)

    Nadimpalli, Chandrasekhar Venkata

    Silicon is gaining importance as a material in micromechanical applications such as micromotors and microactuators. Friction and wear can affect the performance of these devices and hence it is important to study the friction and wear behavior of silicon. The deformation behavior of n-type silicon is fundamentally different from p-type. On deformation, n -type silicon may convert to p-type, but p-type silicon does not convert to n-type on deformation. This is related to the effect of dislocations interacting with the electrical charge carriers. Friction and wear behavior of n and p-type silicon was studied under conditions of sliding wear. Sliding was selected because the stress system associated with sliding introduces large plastic strains at the surface. The friction and wear behavior of n and p-type silicon is expected to be different due to the differences in their deformation behavior. Also, the n to p transition may show up in the friction and wear behavior. The samples were tested in air and in vacuum. Diamond was used as the slider. The wear tracks showed evidence of plastic flow. The morphology of this material was similar to that seen in more ductile materials. The coefficient of friction was also high. Other researchers have reported that DC Silicon transforms to a more ductile phase when sufficient pressure is applied. When shear stresses are present, as in sliding wear, the pressure for phase transformation has been reported to be about 8 GPa. The maximum pressure under the slider in the present set of experiments was estimated to be 8.2 GPa. Therefore, it is possible that transformed material extruded during sliding to produce the flow-like features observed at the wear track. The work involved in this phase transformation, as well as the work in deforming DC Silicon and/or the ductile product phase would contribute to the frictional energy. The debris from the air tests was DC silicon (as determined by XRD and TEM). No significant differences were

  19. Hydrogenated amorphous silicon oxide (a-SiOx:H) single junction solar cell with 8.8% initial efficiency by reducing parasitic absorptions

    NASA Astrophysics Data System (ADS)

    Kim, Do Yun; Guijt, Erwin; van Swaaij, René A. C. M. M.; Zeman, Miro

    2017-04-01

    Hydrogenated amorphous silicon oxide (a-SiOx:H) solar cells have been successfully implemented to multi-junction thin film silicon solar cells. The efficiency of these solar cells, however, has still been below that of state-of-the-art solar cells mainly due to the low Jsc of the a-SiOx:H solar cells and the unbalanced current matching between sub-cells. In this study, we carry out optical simulations to find the main optical losses for the a-SiOx:H solar cell, which so far was mainly optimized for Voc and fill-factor (FF). It is observed that a large portion of the incident light is absorbed parasitically by the p-a-SiOx:H and n-a-SiOx:H layers, although the use of these layers leads to the highest Voc × FF product. When a more transparent and conductive p-nc-SiOx:H layer is substituted for the p-a-SiOx:H layer, the parasitic absorption loss at short wavelengths is notably reduced, leading to higher Jsc. However, this gain in Jsc by the use of the p-nc-SiOx:H compromises the Voc. When replacing the n-a-SiOx:H layer for an n-nc-SiOx:H layer that has low n and k values, the plasmonic absorption loss at the n-nc-SiOx:H/Ag interfaces and the parasitic absorption in the n-nc-SiOx:H are substantially reduced. Implementation of this n-nc-SiOx:H leads to an increase of the Jsc without a drop of the Voc and FF. When implementing a thinner p-a-SiOx:H layer, a thicker i-a-SiOx:H layer, and an n-nc-SiOx:H layer, a-SiOx:H solar cells with not only high Jsc but also high Voc and FF can be fabricated. As a result, an 8.8% a-SiOx:H single junction solar cell is successfully fabricated with a Voc of 1.02 V, a FF of 0.70, and a Jsc of 12.3 mA/cm2, which is the highest efficiency ever reported for this type of solar cell.

  20. Point contact silicon solar cells

    NASA Technical Reports Server (NTRS)

    Swanson, R. M.

    1986-01-01

    The construction of a 22.2% efficient single-crystal silicon solar cell fabricated at Stanford University is described. The cell dimensions were 3 x 5 mm and 100 microns thick with a base lifetime of 500 microseconds. The cell featured light trapping between a texturized top surface and a reflective bottom surface, small point contact diffusions, alternating between n-type and p-type in a polka-dot pattern on the bottom surface, and a surface passivation on all surfaces between contact regions.

  1. Relativistic Doppler reflection as a probe for the initial relaxation of a non-equilibrium electron-hole plasma in silicon

    NASA Astrophysics Data System (ADS)

    Thomson, Mark D.; Meng, Fanqi; Sernelius, Bo E.; Roskos, Hartmut G.

    2015-10-01

    This paper reviews the status of investigations of the relativistic Doppler reflection of a broadband terahertz pulse at a counter-propagating plasma front of photo-excited charge carriers in undoped silicon. When a THz pulse with 20-THz bandwidth impinges onto a moving plasma front with a carrier density in the range of 1019 per cm3, one observes a spectral up-shift, which is, however, much less pronounced than expected from simulations assuming a Drude plasma characterized by a single carrier relaxation time τ of the order of 15-100 fs. Qualitative agreement between simulations and experiments can be achieved if τ is chosen to be less than 5 fs. In order to explore carrier relaxation in more detail, optical-pump/THz-probe experiments in the conventional co-propagation geometry were performed. If the pump-probe delay is long enough for monitoring of the equilibrium value of the scattering time, τ ranges from 200 fs at low carrier density to 20 fs in the 1019-cm-3 density range. For small (sub-picosecond) pump-probe delay, the data reveal a significantly faster scattering, which slows down during energy relaxation of the charge carriers.

  2. Thermal stability of boron nitride/silicon p-n heterojunction diodes

    SciTech Connect

    Teii, Kungen Mizusako, Yusei; Hori, Takuro; Matsumoto, Seiichiro

    2015-10-21

    Heterojunctions of p-type cubic boron nitride (cBN) and n-type silicon with sp{sup 2}-bonded BN (sp{sup 2}BN) interlayers are fabricated under low-energy ion impact by plasma-enhanced chemical vapor deposition, and their rectification properties are studied at temperatures up to 573 K. The rectification ratio is increased up to the order of 10{sup 5} at room temperature by optimizing the thickness of the sp{sup 2}BN interlayer and the cBN fraction for suppressing the reverse leakage current. A highly rectifying p-type cBN/thick sp{sup 2}BN/n-type silicon junction diode shows irreversible rectification properties mainly characterized by a marked decrease in reverse current by an order of magnitude in an initial temperature ramp/down cycle. This irreversible behavior is much more reduced by conducting the cycle twice or more. The temperature-dependent properties confirm an overall increase in effective barrier heights for carrier injection and conduction by biasing at high temperatures, which consequently increases the thermal stability of the diode performance.

  3. Multimode silicon nanowire transistors.

    PubMed

    Glassner, Sebastian; Zeiner, Clemens; Periwal, Priyanka; Baron, Thierry; Bertagnolli, Emmerich; Lugstein, Alois

    2014-11-12

    The combined capabilities of both a nonplanar design and nonconventional carrier injection mechanisms are subject to recent scientific investigations to overcome the limitations of silicon metal oxide semiconductor field effect transistors. In this Letter, we present a multimode field effect transistors device using silicon nanowires that feature an axial n-type/intrinsic doping junction. A heterostructural device design is achieved by employing a self-aligned nickel-silicide source contact. The polymorph operation of the dual-gate device enabling the configuration of one p- and two n-type transistor modes is demonstrated. Not only the type but also the carrier injection mode can be altered by appropriate biasing of the two gate terminals or by inverting the drain bias. With a combined band-to-band and Schottky tunneling mechanism, in p-type mode a subthreshold swing as low as 143 mV/dec and an ON/OFF ratio of up to 10(4) is found. As the device operates in forward bias, a nonconventional tunneling transistor is realized, enabling an effective suppression of ambipolarity. Depending on the drain bias, two different n-type modes are distinguishable. The carrier injection is dominated by thermionic emission in forward bias with a maximum ON/OFF ratio of up to 10(7) whereas in reverse bias a Schottky tunneling mechanism dominates the carrier transport.

  4. Multimode Silicon Nanowire Transistors

    PubMed Central

    2014-01-01

    The combined capabilities of both a nonplanar design and nonconventional carrier injection mechanisms are subject to recent scientific investigations to overcome the limitations of silicon metal oxide semiconductor field effect transistors. In this Letter, we present a multimode field effect transistors device using silicon nanowires that feature an axial n-type/intrinsic doping junction. A heterostructural device design is achieved by employing a self-aligned nickel-silicide source contact. The polymorph operation of the dual-gate device enabling the configuration of one p- and two n-type transistor modes is demonstrated. Not only the type but also the carrier injection mode can be altered by appropriate biasing of the two gate terminals or by inverting the drain bias. With a combined band-to-band and Schottky tunneling mechanism, in p-type mode a subthreshold swing as low as 143 mV/dec and an ON/OFF ratio of up to 104 is found. As the device operates in forward bias, a nonconventional tunneling transistor is realized, enabling an effective suppression of ambipolarity. Depending on the drain bias, two different n-type modes are distinguishable. The carrier injection is dominated by thermionic emission in forward bias with a maximum ON/OFF ratio of up to 107 whereas in reverse bias a Schottky tunneling mechanism dominates the carrier transport. PMID:25303290

  5. Application of porous silicon in terahertz technology

    NASA Astrophysics Data System (ADS)

    Lo, Shu-Zee Alencious

    In this thesis, we discuss our efforts in developing porous silicon based devices for terahertz signal processing. In the first stage of our research, we demonstrate that porous silicon samples fabricated from highly doped p-type silicon can have adjustable refractive indices ranging from 1.5--2.1 and can exhibit a resistivity that is four orders of magnitude higher than that of the silicon wafer from which they were made. We show that the porous silicon becomes stable and relatively lossless after thermal oxidation. The partially oxidized porous silicon is shown to exhibit a smooth absorption spectrum, with low absorption loss of <10 cm-1 over the entire terahertz spectrum. As a proof of concept, we fabricated, for the first time, a porous silicon based multilayered Bragg filter with reflectance of 93% and full-width at half-maximum bandwidth of 0.26 THz. Compared with other multilayered filtering techniques, porous silicon has the advantage that it can be easily fabricated, and offers the possibility of forming multilayer and graded index structures for more advanced filters. The large surface area of nanoporous silicon makes it an especially attractive platform for applications in biochemical detection and diagnostics As part of our effort in developing terahertz waveguide for biosensing, we reported the world's first porous silicon based terahertz waveguide using the principle of surface plasmon polaritons. The effect of porous silicon film thickness on the propagation of surface plasmons is explained theoretically in this thesis and is found to be in good agreement with experimental results.

  6. Ternary chalcogenides Cs2Zn3Se4 and Cs2Zn3Te4 : Potential p -type transparent conducting materials

    DOE PAGES

    Shi, Hongliang; Saparov, Bayrammurad; Singh, David J.; ...

    2014-11-11

    Here we report prediction of two new ternary chalcogenides that can potentially be used as p-type transparent conductors along with experimental synthesis and initial characterization of these previously unknown compounds, Cs2Zn3Ch4 (Ch = Se, Te). In particular, the structures are predicted based on density functional calculations and confirmed by experiments. Phase diagrams, electronic structure, optical properties, and defect properties of Cs2Zn3Se4 and Cs2Zn3Te4 are calculated to assess the viability of these materials as p-type TCMs. Cs2Zn3Se4 and Cs2Zn3Te4, which are stable under ambient air, display large optical band gaps (calculated to be 3.61 and 2.83 eV, respectively) and have smallmore » hole effective masses (0.5-0.77 me) that compare favorably with other proposed p-type TCMs. Defect calculations show that undoped Cs2Zn3Se4 and Cs2Zn3Te4 are p-type materials. However, the free hole concentration may be limited by low-energy native donor defects, e.g., Zn interstitials. Lastly, non-equilibrium growth techniques should be useful for suppressing the formation of native donor defects, thereby increasing the hole concentration.« less

  7. Porous silicon organic vapor sensor

    NASA Astrophysics Data System (ADS)

    Salgado, G. García; Becerril, T. Díaz; Santiesteban, H. Juárez; Andrés, E. Rosendo

    2006-10-01

    In this paper, a porous silicon (PS) layer was investigated as a sensing material to detect organic vapors. The PS was obtained by electrochemical anodization of p-type crystalline silicon (c-Si) in an ethanoic HF solution in order to produce a mesoporous material. The change in the electrical resistance value of the PS layer was used as parameter to sense the presence of the organic vapors (methanol, ethanol, isopropanol, xilene, acetone or water in this work). Gravimetry and infrared spectroscopy (FTIR) were used to characterize the PS layers. As a result, we obtain that the thickness and sensing area of the PS layer produce a great difference in the sensor response. It was also observed that the sensor device had best response for methanol or acetone vapors.

  8. Comprehensive Silicon-Solar-Cell Program

    NASA Technical Reports Server (NTRS)

    Lamorte, Michael F.; Yeager, William M.

    1989-01-01

    Comprehensive Silicon Solar Cell Computer Modeling (SICELL) program simulates silicon solar cell. Predicts device parameters as efficiency, voltage-vs.-current characteristic fill factor, and temperature coefficients of parameters. Technique used similar to numerical-integration methods, but commonality described by use of mesh-point field. Validation studies show accuracies of simulations range from 0.08 percent to 3.6 percent for 27 experimental data points over temperature range of 300K to 421K. Results obtained by use of 10 mesh points in n- and p-type regions and for two iterations. SICELL runs interactively on VAX computer under VMS and written in VAX/VMS FORTRAN 77.

  9. Solid-Source Doping of Float-Zoned Silicon with B, N, O, and C: Preprint

    SciTech Connect

    Ciszek, T. F.

    2003-08-01

    We report on a solid-source method to introduce dopants or controlled impurities directly into the melt zone during float-zone growth of single- or multicrystalline ingots. Unlike the Czochralski (CZ) growth situation, float-zoning allows control over the levels of some impurities (O, C) that cannot be avoided in CZ growth or ingot casting. But aside from impurity studies, the method turns out to be very practical for routine p-type doping in semicontinuous growth processes such as float-zoning, electromagnetic casting, or melt-replenished ribbon growth. Equations governing dopant incorporation, dopant withdrawal, and N co-doping are presented and experimentally verified. Doping uniformity and doping initiation and withdrawal time constants are also reported. The method uses nontoxic source materials and is flexible with quick turnaround times for changing doping levels. Boron p-type doping with nitrogen co-doping is particularly attractive for silicon lattice strengthening against process-induced dislocation motion and also allows greater freedom from incorporation of Si self-interstitial cluster or A and B swirl-type defects and"D"-type microdefects than nitrogen-free p-type material.

  10. Silicon nitride/silicon carbide composite powders

    DOEpatents

    Dunmead, Stephen D.; Weimer, Alan W.; Carroll, Daniel F.; Eisman, Glenn A.; Cochran, Gene A.; Susnitzky, David W.; Beaman, Donald R.; Nilsen, Kevin J.

    1996-06-11

    Prepare silicon nitride-silicon carbide composite powders by carbothermal reduction of crystalline silica powder, carbon powder and, optionally, crystalline silicon nitride powder. The crystalline silicon carbide portion of the composite powders has a mean number diameter less than about 700 nanometers and contains nitrogen. The composite powders may be used to prepare sintered ceramic bodies and self-reinforced silicon nitride ceramic bodies.

  11. CALCULATING THE HABITABLE ZONE OF BINARY STAR SYSTEMS. II. P-TYPE BINARIES

    SciTech Connect

    Haghighipour, Nader; Kaltenegger, Lisa

    2013-11-10

    We have developed a comprehensive methodology for calculating the circumbinary habitable zone (HZ) in planet-hosting P-type binary star systems. We present a general formalism for determining the contribution of each star of the binary to the total flux received at the top of the atmosphere of an Earth-like planet and use the Sun's HZ to calculate the inner and outer boundaries of the HZ around a binary star system. We apply our calculations to the Kepler's currently known circumbinary planetary systems and show the combined stellar flux that determines the boundaries of their HZs. We also show that the HZ in P-type systems is dynamic and, depending on the luminosity of the binary stars, their spectral types, and the binary eccentricity, its boundaries vary as the stars of the binary undergo their orbital motion. We present the details of our calculations and discuss the implications of the results.

  12. Possible efficient p-type doping of AlN using Be: An ab initio study

    NASA Astrophysics Data System (ADS)

    Wu, R. Q.; Shen, L.; Yang, M.; Sha, Z. D.; Cai, Y. Q.; Feng, Y. P.; Huang, Z. G.; Wu, Q. Y.

    2007-10-01

    Spin density functional theory based ab initio study is carried out to investigate the feasibility of fabricating p-type AlN using Be as an efficient dopant. It is found that substitutional BeAl is an acceptor with an activation energy of 0.34eV. To overcome the low solubility of direct incorporation of Be into AlN and self-compensation from Be interstitials, we propose a hydrogen-assisted growth scheme which improves the solubility and suppresses interstitials. Oxygen is also found to be an effective codopant to activate Be in AlN. Our results suggest the possibility of improving p-type conductivity of AlN by Be doping.

  13. Perspectives of High-Temperature Thermoelectric Applications and p-type and n-type Aluminoborides

    NASA Astrophysics Data System (ADS)

    Mori, T.

    2016-10-01

    A need exists to develop high-temperature thermoelectric materials which can utilize high-temperature unutilized/waste heat in thermal power plants, steelworks, factories, incinerators, etc., and also focused solar power. The thermal power plant topping application is of potential high impact since it can sizably increase the efficiency of power plants which are the major supply of electrical power for many countries. Higher borides are possible candidates for their particular high-temperature stability, generally large Seebeck coefficients, α, and intrinsic low thermal conductivity. Excellent (|α| > 200 μV/K) p-type or n-type behavior was recently achieved in the aluminoboride YAl x B14 by varying the occupancy of Al sites, x. Finding p-type and n-type counterparts has long been a difficulty of thermoelectric research not limited to borides. This paper reviews possible high-temperature thermoelectric applications, and recent developments and perspectives of thermoelectric aluminoborides.

  14. Fabrication of p-type lithium niobate crystals by molybdenum doping and polarization

    NASA Astrophysics Data System (ADS)

    Tian, Tian; Kong, Yongfa; Liu, Hongde; Liu, Shiguo; Li, Wei; Chen, Shaolin; Xu, Jiayue

    2017-06-01

    The lack of p-type lithium niobate limits it serving as an active material. A series of Mo-doped and pure congruent lithium niobate crystals were grown by Czochralski method under different polarization conditions. Their dominant carrier species were characterized by holographic experiment. The results showed dominant charge carrier species may be changed from electrons to holes when lithium niobate crystal was doped with Mo ions and polarized under the current of 70mA for 30 minutes. It indicated that p-type lithium niobate crystal could be fabricated by Mo-doping and suitably controlling the polarization condition. Mo-doped lithium niobate crystals can be a promising candidate for active components.

  15. P-type conductive amorphous oxides of transition metals from solution processing

    NASA Astrophysics Data System (ADS)

    Li, Jinwang; Kaneda, Toshihiko; Tokumitsu, Eisuke; Koyano, Mikio; Mitani, Tadaoki; Shimoda, Tatsuya

    2012-07-01

    We report a series of solution-processed p-type conductive amorphous Ln-M-O (a-Ln-M-O, where M = Ru, Ir, and Ln is a lanthanide element except Ce) having low resistivities (10-3 to 10-2 Ω cm). These oxides are thermally stable to a high degree, being amorphous up to 800 °C, and processable below 400 °C. Their film surfaces are smooth on the atomic scale, and the process allows patterning simply by direct imprinting without distortion of the pattern after annealing. These properties have high potential for use in printed electronics. The electron configurations of these oxides are apparently different from existing p-type oxides.

  16. Surface ferromagnetic p-type ZnO nanowires through charge transfer doping.

    PubMed

    Lee, Sung-Hoon; Kim, Jongseob; Hong, Ki-Ha; Shin, Jaikwang; Kim, Sungjin; Kim, Kinam

    2012-03-01

    We report first-principles theoretical investigation of p-type charge transfer doping of zinc oxide (ZnO) nanowires by molecular adsorption. We find that spontaneous dissociative adsorption of fluorine molecules introduces half-emptying of otherwise fully filled oxygen-derived surface states. The resulting surface Fermi level is so close to the valence band maximum of the ZnO nanowire that the nanowire undergoes significant p-type charge transfer doping. Those half-filled surface states are fully spin-polarized and lead to surface ferromagnetism that is stable at room temperature. We also analyze the kinetic control regime of the surface transfer doping and find that it may result in nonequilibrium steady states. The present results suggest that postgrowth engineering of surface states has high potential in manipulating ZnO nanostructures useful for both electronics and spintronics. © 2012 American Chemical Society

  17. Ferromagnetism in p-Type Manganese-Doped Zinc Oxide Quantum Dots.

    PubMed

    May, Joseph W; McMorris, Ryan J; Li, Xiaosong

    2012-05-17

    The magnetic exchange interactions between paramagnetic Mn(2+) dopants in the presence of a N(2-) p-type defect in zinc oxide quantum dots are studied using density functional theory. Spin-dependent delocalization of the N(2-) 2p acceptor level among the nearest-neighbor Mn(2+) dopants is observed. The calculations show that parallel Mn(2+) spin alignment is favored upon the formation of a nitrogen-bridged Mn-Mn dimer. Although the effect is short-ranged, the observed magnitude of stabilization of the ferromagnetic alignment of nearest-neighbor Mn(2+) spins arises from p-d exchange and suggests p-type Mn(2+)-doped ZnO quantum dots as excellent candidates for exhibiting room-temperature ferromagnetism. Analytical expressions are derived and supported by density functional theory calculations that show that the N(2-) concentration has a stronger influence on the magnetic splitting compared with that of the Mn(2+) concentration.

  18. p-type ZnS:N nanowires: Low-temperature solvothermal doping and optoelectronic properties

    SciTech Connect

    Wang, Ming-Zheng; Xie, Wei-Jie; Hu, Han; Yu, Yong-Qiang; Wu, Chun-Yan; Wang, Li; Luo, Lin-Bao

    2013-11-18

    Nitrogen doped p-type ZnS nanowires (NWs) were realized using thermal decomposition of triethylamine at a mild temperature. Field-effect transistors made from individual ZnS:N NWs revealed typical p-type conductivity behavior, with a hole mobility of 3.41 cm{sup 2}V{sup −1}s{sup −1} and a hole concentration of 1.67 × 10{sup 17} cm{sup −3}, respectively. Further analysis found that the ZnS:N NW is sensitive to UV light irradiation with high responsivity, photoconductive gain, and good spectral selectivity. The totality of this study suggests that the solvothermal doping method is highly feasible to dope one dimensional semiconductor nanostructures for optoelectronic devices application.

  19. Measurement of the dead layer thickness in a p-type point contact germanium detector

    NASA Astrophysics Data System (ADS)

    Jiang, Hao; Yue, Qian; Li, Yu-Lan; Kang, Ke-Jun; Li, Yuan-Jing; Li, Jin; Lin, Shin-Ted; Liu, Shu-Kui; Ma, Hao; Ma, Jing-Lu; Su, Jian; Tsz-King Wong, Henry; Yang, Li-Tao; Zhao, Wei; Zeng, Zhi

    2016-09-01

    A 994 g mass p-type PCGe detector has been deployed during the first phase of the China Dark matter EXperiment, aiming at direct searches for light weakly interacting massive particles. Measuring the thickness of the dead layer of a p-type germanium detector is an issue of major importance since it determines the fiducial mass of the detector. This work reports a method using an uncollimated 133Ba source to determine the dead layer thickness. The experimental design, data analysis and Monte Carlo simulation processes, as well as the statistical and systematic uncertainties are described. A dead layer thickness of 1.02 mm was obtained based on a comparison between the experimental data and the simulated results. Supported by National Natural Science Foundation of China (10935005, 10945002, 11275107, 11175099)

  20. Temperature driven p-n-p type conduction switching materials: current trends and future directions.

    PubMed

    Guin, Satya N; Biswas, Kanishka

    2015-04-28

    Modern technological inventions have been going through a "renaissance" period. Development of new materials and understanding of fundamental structure-property correlations are the important steps to move further for advanced technologies. In modern technologies, inorganic semiconductors are the leading materials which are extensively used for different applications. In the current perspective, we present discussion on an important class of materials that show fascinating p-n-p type conduction switching, which can have potential applications in diodes or transistor devices that operate reversibly upon temperature or voltage change. We highlight the key concepts, present the current fundamental understanding and show the latest developments in the field of p-n-p type conduction switching. Finally, we point out the major challenges and opportunities in this field.

  1. Effects of hole localization on limiting p-type conductivity in oxide and nitride semiconductors

    SciTech Connect

    Lyons, J. L.; Janotti, A.; Van de Walle, C. G.

    2014-01-07

    We examine how hole localization limits the effectiveness of substitutional acceptors in oxide and nitride semiconductors and explain why p-type doping of these materials has proven so difficult. Using hybrid density functional calculations, we find that anion-site substitutional impurities in AlN, GaN, InN, and ZnO lead to atomic-like states that localize on the impurity atom itself. Substitution with cation-site impurities, on the other hand, triggers the formation of polarons that become trapped on nearest-neighbor anions, generally leading to large ionization energies for these acceptors. Unlike shallow effective-mass acceptors, these two types of deep acceptors couple strongly with the lattice, significantly affecting the optical properties and severely limiting prospects for achieving p-type conductivity in these wide-band-gap materials.

  2. Infrared absorption and visible transparency in heavily doped p-type BaSnO3

    NASA Astrophysics Data System (ADS)

    Li, Yuwei; Sun, Jifeng; Singh, David J.

    2017-01-01

    The recent experimental work shows that perovskite BaSnO3 can be heavily doped by K to become a stable p-type semiconductor. Here, we find that p-type perovskite BaSnO3 retains transparency for visible light while absorbing strongly in the infrared below 1.5 eV. The origin of the remarkable optical transparency even with heavy doping is that the interband transitions that are enabled by empty states at the top of the valence band are concentrated mainly in the energy range from 0.5 to 1.5 eV, i.e., not extending past the near IR. In contrast to n-type, the Burstein-Moss shift is slightly negative, but very small reflecting the heavier valence bands relative to the conduction bands.

  3. Ultra-thin ohmic contacts for p-type nitride light emitting devices

    DOEpatents

    Raffetto, Mark; Bharathan, Jayesh; Haberern, Kevin; Bergmann, Michael; Emerson, David; Ibbetson, James; Li, Ting

    2014-06-24

    A flip-chip semiconductor based Light Emitting Device (LED) can include an n-type semiconductor substrate and an n-type GaN epi-layer on the substrate. A p-type GaN epi-layer can be on the n-type GaN epi-layer and a metal ohmic contact p-electrode can be on the p-type GaN epi-layer, where the metal ohmic contact p-electrode can have an average thickness less than about 25 .ANG.. A reflector can be on the metal ohmic contact p-electrode and a metal stack can be on the reflector. An n-electrode can be on the substrate opposite the n-type GaN epi-layer and a bonding pad can be on the n-electrode.

  4. Detection of minority carrier traps in p-type 4H-SiC

    SciTech Connect

    Alfieri, G.; Kimoto, T.

    2014-03-03

    Contrarily to the case of n-type 4H-SiC, very little is known about the presence of minority carrier traps in p-type epilayers. In this study, we performed the electrical characterization of as-grown, electron irradiated, and thermally oxidized p-type 4H-SiC, by using minority carrier transient spectroscopy. Four minority carrier traps are reported in 1.6–2.3 eV energy range above the valence band edge (E{sub V}). Particular emphasis is given to the mid-gap minority carrier trap (EH{sub 6∕7}) and to its correlation to an energetically close mid-gap majority carrier trap (HK4)

  5. P-Type Transparent Cu-Alloyed ZnS Deposited at Room Temperature

    SciTech Connect

    Woods-Robinson, Rachel; Cooper, Jason K.; Xu, Xiaojie; Schelhas, Laura T.; Pool, Vanessa L.; Faghaninia, Alireza; Lo, Cynthia S.; Toney, Michael F.; Sharp, Ian D.; Ager, Joel W.

    2016-03-16

    All transparent conducting materials (TCMs) of technological practicality are n-type; the inferior conductivity of p-type TCMs has limited their adoption. Additionally, many relatively high-performing p-type TCMs require synthesis temperatures > 400 °C. Here, room-temperature pulsed laser deposition of copper-alloyed zinc sulfide (Cu x Zn 1- x S) thin films (0 ≤ x ≤ 0.75) is reported. For 0.09 ≤ x ≤ 0.35, Cu x Zn 1- x S has high p-type conductivity, up to 42 S cm -1 at x = 0.30, with an optical band gap tunable from ≈3.0–3.3 eV and transparency, averaged over the visible, of 50%–71% for 200–250 nm thick films. In this range, synchrotron X-ray and electron diffraction reveal a nanocrystalline ZnS structure. Secondary crystalline Cu y S phases are not observed, and at higher Cu concentrations, x > 0.45, films are amorphous and poorly conducting. Furthermore, within the TCM regime, the conductivity is temperature independent, indicating degenerate hole conduction. A decrease in lattice parameter with Cu content suggests that the hole conduction is due to substitutional incorporation of Cu onto Zn sites. This hole-conducting phase is embedded in a less conducting amorphous Cu y S, which dominates at higher Cu concentrations. Finally, the combination of high hole conductivity and optical transparency for the peak conductivity Cu x Zn 1- x S films is among the best reported to date for a room temperature deposited p-type TCM.

  6. P-Type Transparent Cu-Alloyed ZnS Deposited at Room Temperature

    DOE PAGES

    Woods-Robinson, Rachel; Cooper, Jason K.; Xu, Xiaojie; ...

    2016-03-16

    All transparent conducting materials (TCMs) of technological practicality are n-type; the inferior conductivity of p-type TCMs has limited their adoption. Additionally, many relatively high-performing p-type TCMs require synthesis temperatures > 400 °C. Here, room-temperature pulsed laser deposition of copper-alloyed zinc sulfide (Cu x Zn 1- x S) thin films (0 ≤ x ≤ 0.75) is reported. For 0.09 ≤ x ≤ 0.35, Cu x Zn 1- x S has high p-type conductivity, up to 42 S cm -1 at x = 0.30, with an optical band gap tunable from ≈3.0–3.3 eV and transparency, averaged over the visible, of 50%–71% formore » 200–250 nm thick films. In this range, synchrotron X-ray and electron diffraction reveal a nanocrystalline ZnS structure. Secondary crystalline Cu y S phases are not observed, and at higher Cu concentrations, x > 0.45, films are amorphous and poorly conducting. Furthermore, within the TCM regime, the conductivity is temperature independent, indicating degenerate hole conduction. A decrease in lattice parameter with Cu content suggests that the hole conduction is due to substitutional incorporation of Cu onto Zn sites. This hole-conducting phase is embedded in a less conducting amorphous Cu y S, which dominates at higher Cu concentrations. Finally, the combination of high hole conductivity and optical transparency for the peak conductivity Cu x Zn 1- x S films is among the best reported to date for a room temperature deposited p-type TCM.« less

  7. Method for producing high carrier concentration p-Type transparent conducting oxides

    DOEpatents

    Li, Xiaonan; Yan, Yanfa; Coutts, Timothy J.; Gessert, Timothy A.; Dehart, Clay M.

    2009-04-14

    A method for producing transparent p-type conducting oxide films without co-doping plasma enhancement or high temperature comprising: a) introducing a dialkyl metal at ambient temperature and a saturated pressure in a carrier gas into a low pressure deposition chamber, and b) introducing NO alone or with an oxidizer into the chamber under an environment sufficient to produce a metal-rich condition to enable NO decomposition and atomic nitrogen incorporation into the formed transparent metal conducting oxide.

  8. Low-temperature solution-processed p-type vanadium oxide for perovskite solar cells.

    PubMed

    Sun, Haocheng; Hou, Xiaomeng; Wei, Qiulong; Liu, Huawei; Yang, Kecheng; Wang, Wei; An, Qinyou; Rong, Yaoguang

    2016-06-21

    A low-temperature solution-processed inorganic p-type contact material of vanadium oxide (VOx) was developed to fabricate planar-heterojunction perovskite solar cells. Using a solvent-assisted process, high-quality uniform and compact perovskite (CH3NH3PbI3) films were deposited on VOx coated substrates. Due to the high transmittance and quenching efficiency of VOx layers, a power conversion efficiency of over 14% was achieved.

  9. Investigation of negative photoconductivity in p-type Pb1-xSnxTe film

    NASA Astrophysics Data System (ADS)

    Tavares, M. A. B.; da Silva, M. J.; Peres, M. L.; de Castro, S.; Soares, D. A. W.; Okazaki, A. K.; Fornari, C. I.; Rappl, P. H. O.; Abramof, E.

    2017-01-01

    We investigated the negative photoconductivity (NPC) effect that was observed in a p-type Pb1-xSnxTe film for temperatures varying from 300 K down to 85 K. We found that this effect is a consequence of defect states located in the bandgap which act as trapping levels, changing the relation between generation and recombination rates. Theoretical calculations predict contributions to the NPC from both conduction and valence bands, which are in accordance with the experimental observations.

  10. Metallurgical Route to Produce Upgraded Silicon and Monosilane

    SciTech Connect

    Mukashev, B. N.; Abdullin, Kh A.; Tamendarov, M. F.; Turmagambetov, T. S.; Beketov, B. A.; Page, M. R.; Kline, D. M.

    2009-01-01

    We studied alumothermic reduction of silica from silicate slag to obtain silicon-containing Alloy-I and Alloy-II. Phosphorous industry waste and synthetic slag are used as a silicate slag that consists of more than 90% silicon and calcium oxides and less than l0% other elemental oxides. Silicon-containing Alloy-I was upgraded by acid leaching to silicon of a fine powder structure. Using this powder, we grew poly- and mono-crystalline p-type silicon, with resistivity of 0.24 {Omega} cm, by the Czochralski method. Silicon-containing Alloy-II was used for obtaining monosilane by aqueous treatment with hydrochloric acid under atmospheric conditions and without any catalyst. There was no trace of diborane, which is a common source for boron contamination in crude silane.

  11. Ferromagnetism in Silicon Single Crystals with Positively Charged Vacancy Clusters

    NASA Astrophysics Data System (ADS)

    Liu, Yu; Zhang, Xinghong; Yuan, Quan; Han, Jiecai; Zhou, Shengqiang; Song, Bo

    Defect-induced ferromagnetism provides an alternative for organic and semiconductor spintronics. Here, we investigated the magnetism in Silicon after neutron irradiation and try to correlate the observed magnetism to particular defects in Si. Commercially available p-type Si single crystal wafer is cut into pieces for performing neutron irradiations. The magnetic impurities are ruled out as they can not be detected by secondary ion mass spectroscopy. With positron annihilation lifetime spectroscopy, the positron trapping center corresponding to lifetime 375 ps is assigned to a kind of stable vacancy clusters of hexagonal rings (V6) and its concentration is enhanced by increasing neutron doses. After irradiation, the samples still show strong diamagnetism. The weak ferromagnetic signal in Si after irradiation enhances and then weakens with increasing irradiation doses. The saturation magnetization at room temperature is almost the same as that at 5 K. The X-ray magnetic circular dichroism further provides the direct evidence that Silicon is the origin of this ferromagnetism. Using first-principles calculations, it is found that positively charged V6 brings the spin polarization and the defects have coupling with each other. The work is financially supported by the Helmholtz Postdoc Programme (Initiative and Networking Fund, PD-146).

  12. Guided Growth of Horizontal p-Type ZnTe Nanowires

    PubMed Central

    2016-01-01

    A major challenge toward large-scale integration of nanowires is the control over their alignment and position. A possible solution to this challenge is the guided growth process, which enables the synthesis of well-aligned horizontal nanowires that grow according to specific epitaxial or graphoepitaxial relations with the substrate. However, the guided growth of horizontal nanowires was demonstrated for a limited number of materials, most of which exhibit unintentional n-type behavior. Here we demonstrate the vapor–liquid–solid growth of guided horizontal ZnTe nanowires and nanowalls displaying p-type behavior on four different planes of sapphire. The growth directions of the nanowires are determined by epitaxial relations between the nanowires and the substrate or by a graphoepitaxial effect that guides their growth along nanogrooves or nanosteps along the surface. We characterized the crystallographic orientations and elemental composition of the nanowires using transmission electron microscopy and photoluminescence. The optoelectronic and electronic properties of the nanowires were studied by fabricating photodetectors and top-gate thin film transistors. These measurements showed that the guided ZnTe nanowires are p-type semiconductors and are photoconductive in the visible range. The guided growth of horizontal p-type nanowires opens up the possibility of parallel nanowire integration into functional systems with a variety of potential applications not available by other means. PMID:27885331

  13. Band alignment and p -type doping of ZnSnN2

    NASA Astrophysics Data System (ADS)

    Wang, Tianshi; Ni, Chaoying; Janotti, Anderson

    2017-05-01

    Composed of earth-abundant elements, ZnSnN2 is a promising semiconductor for photovoltaic and photoelectrochemical applications. However, basic properties such as the precise value of the band gap and the band alignment to other semiconductors are still unresolved. For instance, reported values for the band gap vary from 1.4 to 2.0 eV. In addition, doping in ZnSnN2 remains largely unexplored. Using density functional theory with the Heyd-Scuseria-Ernzerhof hybrid functional, we investigate the electronic structure of ZnSnN2, its band alignment to GaN and ZnO, and the possibility of p -type doping. We find that the position of the valence-band maximum of ZnSnN2 is 0.39 eV higher than that in GaN, yet the conduction-band minimum is close to that in ZnO, which suggests that achieving p -type conductivity is likely as in GaN, yet it may be difficult to control unintentional n -type conductivity as in ZnO. Among possible p -type dopants, we explore Li, Na, and K substituting on the Zn site. We show that while LiZn is a shallow acceptor, NaZn and KZn are deep acceptors, which we trace back to large local relaxations around the Na and K impurities due to the atomic size mismatches.

  14. Enhanced thermopower and low thermal conductivity in p-type polycrystalline ZrTe5

    NASA Astrophysics Data System (ADS)

    Hooda, M. K.; Yadav, C. S.

    2017-07-01

    Thermoelectric properties of polycrystalline p-type ZrTe5 are reported in the temperature (T) range of 2-340 K. Thermoelectric power (S) is positive and reaches up to 458 μV/K at 340 K on increasing T. The value of Fermi energy 16 meV suggests a low carrier density of ≈9.5 × 1018 cm-3. A sharp anomaly in S data is observed at 38 K, which seems intrinsic to p-type ZrTe5. The thermal conductivity (κ) value is low (2 W/m K at T = 300 K) with major contribution from the lattice part. Electrical resistivity data show the metal to semiconductor transition at T ˜ 150 K and non-Arrhenius behavior in the semiconducting region. The figure of merit zT (0.026 at T = 300 K) is ˜63% higher than that of HfTe5 (0.016) and better than those of the conventional SnTe, p-type PbTe, and bipolar pristine ZrTe5 compounds.

  15. Doping CoSb3 p-type with Al substitution for Sb

    NASA Astrophysics Data System (ADS)

    Adams, Michael J.; Nielsen, Michele D.; Heremans, Joseph P.

    2014-03-01

    Skutterudites such as CoSb3 are compounds composed of group IX-B atoms (Co, Rh, and Ir) forming a simple cubic structure, and group V-A3 pnictide atoms (primarily Sb and As) forming rings inside 6 of every 8 cubes. The remaining cubes remain empty. A common method for reducing thermal conductivity is to introduce impurity atoms such as rare-earths in the cubes that act as rattlers. P-type doping of CoSb3 has led to some advances in zT, but the p-type material remains less performing than the n-type material due to the fact that the valence band, dominated by Sb levels, has a low effective mass. A promising method for improving p-type properties is to introduce an effective resonant level into the energy levels occupied by the light hole band, thereby increasing the Seebeck coefficient without strongly effecting other transport properties. A first attempt using Sn substitution was not successful. Here we try various concentrations of Al substituted at Sb sites to generate a resonant level. Material properties are measured and compared with a calculated Pisarenko relation, where thermopower is plotted as a function of hole concentration. Financial support for this investigation was provided by the U.S. Department of Energy (DOE)-U.S.-China Clean Energy Research Center (CERC-CVC) under the award No. DE-PI0000012.

  16. Effect of N2 flow during deposition on p-type ZnO film

    NASA Astrophysics Data System (ADS)

    Lin, Chiung-Wei; Liu, Bor-Chang

    2017-01-01

    In this study, the influence of a nitrogen source on p-type conductive ZnO films was studied. Rapid thermal oxidation was conducted to oxidize ZnN films and convert them to ZnO films. When an as-deposited ZnN film was prepared at a high nitrogen gas flow rate, the converted ZnO film possessed many acceptors and showed stable p-type conduction. This p-type conduction was attributed to the nitrogen gas flow providing many “No” states, which act as acceptors within the processed ZnO film. It was found that the as-deposited ZnN film prepared at a high nitrogen gas flow rate is oxidized slightly so that only a few nitrogen atoms were replaced by oxygen. The carrier concentration and mobility of the optimized oxidized ZnN film were 9.76 × 1017 cm-3 and 62.78 cm2 V-1 s-1, respectively. A good rectified current-voltage characteristic with a turn-on voltage of 3.65 V was achieved for the optimized ZnO:N/ZnO junction.

  17. Demethoxycurcumin Is A Potent Inhibitor of P-Type ATPases from Diverse Kingdoms of Life

    PubMed Central

    Dao, Trong Tuan; Sehgal, Pankaj; Tung, Truong Thanh; Møller, Jesper Vuust; Nielsen, John; Palmgren, Michael; Christensen, Søren Brøgger

    2016-01-01

    P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used as drugs. In this work a library of natural compounds was screened and we first identified curcuminoids as plasma membrane H+-ATPases inhibitors in plant and fungal cells. We also found that some of the commercial curcumins contain several curcuminoids. Three of these were purified and, among the curcuminoids, demethoxycurcumin was the most potent inhibitor of all tested P-type ATPases from fungal (Pma1p; H+-ATPase), plant (AHA2; H+-ATPase) and animal (SERCA; Ca2+-ATPase) cells. All three curcuminoids acted as non-competitive antagonist to ATP and hence may bind to a highly conserved allosteric site of these pumps. Future research on biological effects of commercial preparations of curcumin should consider the heterogeneity of the material. PMID:27644036

  18. Efficient synthesis of triarylamine-based dyes for p-type dye-sensitized solar cells

    NASA Astrophysics Data System (ADS)

    Wild, Martin; Griebel, Jan; Hajduk, Anna; Friedrich, Dirk; Stark, Annegret; Abel, Bernd; Siefermann, Katrin R.

    2016-05-01

    The class of triarylamine-based dyes has proven great potential as efficient light absorbers in inverse (p-type) dye sensitized solar cells (DSSCs). However, detailed investigation and further improvement of p-type DSSCs is strongly hindered by the fact that available synthesis routes of triarylamine-based dyes are inefficient and particularly demanding with regard to time and costs. Here, we report on an efficient synthesis strategy for triarylamine-based dyes for p-type DSSCs. A protocol for the synthesis of the dye-precursor (4-(bis(4-bromophenyl)amino)benzoic acid) is presented along with its X-ray crystal structure. The dye precursor is obtained from the commercially available 4(diphenylamino)benzaldehyde in a yield of 87% and serves as a starting point for the synthesis of various triarylamine-based dyes. Starting from the precursor we further describe a synthesis protocol for the dye 4-{bis[4‧-(2,2-dicyanovinyl)-[1,1‧-biphenyl]-4-yl]amino}benzoic acid (also known as dye P4) in a yield of 74%. All synthesis steps are characterized by high yields and high purities without the need for laborious purification steps and thus fulfill essential requirements for scale-up.

  19. Efficient synthesis of triarylamine-based dyes for p-type dye-sensitized solar cells

    PubMed Central

    Wild, Martin; Griebel, Jan; Hajduk, Anna; Friedrich, Dirk; Stark, Annegret; Abel, Bernd; Siefermann, Katrin R.

    2016-01-01

    The class of triarylamine-based dyes has proven great potential as efficient light absorbers in inverse (p-type) dye sensitized solar cells (DSSCs). However, detailed investigation and further improvement of p-type DSSCs is strongly hindered by the fact that available synthesis routes of triarylamine-based dyes are inefficient and particularly demanding with regard to time and costs. Here, we report on an efficient synthesis strategy for triarylamine-based dyes for p-type DSSCs. A protocol for the synthesis of the dye-precursor (4-(bis(4-bromophenyl)amino)benzoic acid) is presented along with its X-ray crystal structure. The dye precursor is obtained from the commercially available 4(diphenylamino)benzaldehyde in a yield of 87% and serves as a starting point for the synthesis of various triarylamine-based dyes. Starting from the precursor we further describe a synthesis protocol for the dye 4-{bis[4′-(2,2-dicyanovinyl)-[1,1′-biphenyl]-4-yl]amino}benzoic acid (also known as dye P4) in a yield of 74%. All synthesis steps are characterized by high yields and high purities without the need for laborious purification steps and thus fulfill essential requirements for scale-up. PMID:27196877

  20. Electronic inhomogeneity in n- and p-type PbTe detected by 125Te NMR

    NASA Astrophysics Data System (ADS)

    Levin, E. M.; Heremans, J. P.; Kanatzidis, M. G.; Schmidt-Rohr, K.

    2013-09-01

    125Te nuclear magnetic resonance spectra and spin-lattice relaxation of n- and p-type PbTe, self-doping narrow band-gap semiconductors, have been studied and compared to those of p-type GeTe. Spin-lattice relaxation in GeTe can be fit by one component, while that in both PbTe samples must be fit by at least two components, showing electronically homogeneous and inhomogeneous materials, respectively. For PbTe-based materials, the spin-lattice relaxation rate 1/T1 increases linearly with carrier concentration. The data for GeTe fall on the same line and allow us to extend this plot to higher concentrations. Long and short T1 components in both PbTe samples reflect “low,” ˜1017 cm-3, and “high,” ˜1018 cm-3, carrier concentration components. Carrier concentrations in both n- and p-type PbTe samples obtained from the Hall and Seebeck effects generally match the “high” carrier concentration component, and to some extent, ignore the “low” one. This demonstrates that the Hall and Seebeck effects may have a limited ability for the determination of carrier concentration in complex thermoelectric PbTe-based and other multicomponent materials.

  1. Computational design of p-type contacts for MoS2-based electronic devices

    NASA Astrophysics Data System (ADS)

    Kumar, Priyank; Musso, Tiziana; Foster, Adam; Grossman, Jeffrey

    2015-03-01

    The excellent physical and semiconducting properties of transition metal dichalcogenide (TMDC) monolayers make them promising materials for many applications. A well-known example is MoS2, which has gained significant attention as a channel material for next-generation transistors. While n-type MoS2 field-effect transistors (n-FETs) can be fabricated with relative ease, fabrication of p-FETs remains a challenge as the Fermi-level of elemental metals used as contacts are pinned close to the conduction band, leading to large p-type Schottky barrier heights (SBHs). Using ab initio computations, we design and propose efficient hole contacts utilizing high work function oxide-based hole injection materials, with the aim of advancing p-type MoS2 device technology. Our calculations will highlight the possibility to tune and lower the p-type SBH at the metal/semiconductor interface by controlling the structural properties of oxide materials. Taken together, our results provide an interesting platform for experimental design of next-generation MoS2-based electronic and optoelectronic devices.

  2. Real-time photoelectron spectroscopy study of the oxidation reaction kinetics on p-type and n-type Si (001) surfaces

    NASA Astrophysics Data System (ADS)

    Yu, Zhou

    further work is necessary to update and modify the traditional Si (001) oxidation models that had been accepted for several decades. To update and complement the Si (001) oxidation kinetics, an understanding of the temperature and dopant factor during initial oxidation kinetics on Si (001) is our first step. In this study, real-time photoelectron spectroscopy is applied to characterize the oxidized (001) surface and surface information was collected by ultraviolet photoelectron spectroscopy technique. By analyzing parameters such as O 2p spectra uptake, change of work function and the surface state in respect of p- and n- type Si (001) substrate under different temperature, the oxygen adsorption structure and the dopant factor can be determined. In this study, experiments with temperature gradients on p-type Si (001) were conducted and this aims to clarify the temperature dependent characteristic of Si (001) surface oxidation. A comparison of the O 2p uptake, change of work function and surface state between p-and n-type Si (001) is made under a normal temperature and these provides with the data to explain how the dopant factor impacts the oxygen adsorption structure on the surface. In the future, the study of the oxygen adsorption structure will lead to an explanation of the surface strain that discovered; therefore, fundamental of the initial oxidation on Si (001) would be updated and complemented, which would contribute to the future gate technology in MOSFET and CMOS.

  3. Characterization of near-infrared n-type {beta}-FeSi{sub 2}/p-type Si heterojunction photodiodes at room temperature

    SciTech Connect

    Shaban, Mahmoud; Nomoto, Keita; Izumi, Shota; Yoshitake, Tsuyoshi

    2009-06-01

    n-type {beta}-FeSi{sub 2}/p-type Si heterojunctions were fabricated from {beta}-FeSi{sub 2} films epitaxially grown on Si(111) by facing-target direct-current sputtering. Sharp film-substrate interfaces were confirmed by scanning electron microscopy. The current-voltage and photoresponse characteristics were measured at room temperature. They exhibited good rectifying properties and a change of approximately one order of magnitude in the current at a bias voltage of -1 V under illumination by a 6 mW, 1.31 {mu}m laser. The estimated detectivity was 1.5x10{sup 9} cm {radical}Hz W at 1.31 {mu}m. The results suggest that the {beta}-FeSi{sub 2}/Si heterojunctions can be used as near-infrared photodetectors that are compatible with silicon integrated circuits.

  4. Inversion charge modeling in n-type and p-type Double-Gate MOSFETs including quantum effects: The role of crystallographic orientation

    NASA Astrophysics Data System (ADS)

    Balaguer, M.; Roldán, J. B.; Donetti, L.; Gámiz, F.

    2012-01-01

    We have developed an advanced inversion charge model for both n-type and p-type symmetrical Double-Gate MOSFETs where quantum mechanical effects (QMEs) have been included. By doing so, the role of different crystallographic orientations was successfully taken into account. Self-consistent Poisson and Schrödinger simulators were used to check the accuracy of the model presented. As a starting point, a classical inversion charge centroid model was considered. Afterwards, an inversion charge model was developed including QMEs by means of a corrected oxide capacitance. The validity of the model was checked for the three common wafer orientations (1 0 0), (1 1 0) and (1 1 1) and for devices with different silicon layer ( tSi) and oxide ( tox) thicknesses. As it will be shown, the model reproduces correctly the simulation data both in the subthreshold and in the strong inversion operation regime.

  5. Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH3)3

    PubMed Central

    Filonovich, Sergej Alexandrovich; Águas, Hugo; Busani, Tito; Vicente, António; Araújo, Andreia; Gaspar, Diana; Vilarigues, Marcia; Leitão, Joaquim; Fortunato, Elvira; Martins, Rodrigo

    2012-01-01

    We have characterized the structure and electrical properties of p-type nanocrystalline silicon films prepared by radio-frequency plasma-enhanced chemical vapor deposition and explored optimization methods of such layers for potential applications in thin-film solar cells. Particular attention was paid to the characterization of very thin (∼20 nm) films. The cross-sectional morphology of the layers was studied by fitting the ellipsometry spectra using a multilayer model. The results suggest that the crystallization process in a high-pressure growth regime is mostly realized through a subsurface mechanism in the absence of the incubation layer at the substrate-film interface. Hydrogen plasma treatment of a 22-nm-thick film improved its electrical properties (conductivity increased more than ten times) owing to hydrogen insertion and Si structure rearrangements throughout the entire thickness of the film. PMID:27877504

  6. Surface property modification of silicon

    NASA Technical Reports Server (NTRS)

    Danyluk, S.

    1984-01-01

    The main emphasis of this work has been to determine the wear rate of silicon in fluid environments and the parameters that influence wear. Three tests were carried out on single crystal Czochralski silicon wafers: circular and linear multiple-scratch tests in fluids by a pyramidal diamond simulated fixed-particle abrasion; microhardness and three-point bend tests were used to determine the hardness and fracture toughness of abraded silicon and the extent of damage induced by abrasion. The wear rate of (100) and (111) n and p-type single crystal Cz silicon abraded by a pyramidal diamond in ethanol, methanol, acetone and de-ionized water was determined by measuring the cross-sectional areas of grooves of the circular and linear multiple-scratch tests. The wear rate depends on the loads on the diamond and is highest for ethanol and lowest for de-ionized water. The surface morphology of the grooves showed lateral and median cracks as well as a plastically deformed region. The hardness and fracture toughness are critical parameters that influence the wear rate. Microhardness tests were conducted to determine the hardness as influenced by fluids. Median cracks and the damage zone surrounding the indentations were also related to the fluid properties.

  7. Investigation of Defects Origin in p-Type Si for Solar Applications

    NASA Astrophysics Data System (ADS)

    Gwóźdź, Katarzyna; Placzek-Popko, Ewa; Mikosza, Maciej; Zielony, Eunika; Pietruszka, Rafal; Kopalko, Krzysztof; Godlewski, Marek

    2017-07-01

    In order to improve the efficiency of a solar cell based on silicon, one must find a compromise between its price and crystalline quality. That is precisely why the knowledge of defects present in the material is of primary importance. This paper studies the defects in commercially available cheap Schottky titanium/gold silicon wafers. The electrical properties of the diodes were defined by using current-voltage and capacitance-voltage measurements. Low series resistance and ideality factor are proofs of the good quality of the sample. The concentration of the acceptors is in accordance with the manufacturer's specifications. Deep level transient spectroscopy measurements were used to identify the defects. Three hole traps were found with activation energies equal to 0.093 eV, 0.379 eV, and 0.535 eV. Comparing the values with the available literature, the defects were determined as connected to the presence of iron interstitials in the silicon. The quality of the silicon wafer seems good enough to use it as a substrate for the solar cell heterojunctions.

  8. Development of small-animal PET prototype using silicon photomultiplier (SiPM): initial results of phantom and animal imaging studies.

    PubMed

    Kwon, Sun Il; Lee, Jae Sung; Yoon, Hyun Suk; Ito, Mikiko; Ko, Guen Bae; Choi, Jae Yeon; Lee, Sung-Hyuk; Chan Song, In; Jeong, Jae Min; Lee, Dong Soo; Hong, Seong Jong

    2011-04-01

    Silicon photomultiplier (SiPM; also called a Geiger-mode avalanche photodiode) is a promising semiconductor photosensor in PET and PET/MRI because it is intrinsically MRI-compatible and has internal gain and timing properties comparable to those of a photomultiplier tube. In this study, we have developed a small-animal PET system using SiPMs and lutetium gadolinium oxyorthosilicate (LGSO) crystals and performed physical evaluation and animal imaging studies to show the feasibility of this system. The SiPM PET system consists of 8 detectors, each of which comprises 2 × 6 SiPMs and 4 × 13 LGSO crystals. Each crystal has dimensions of 1.5 × 1.5 × 7 mm. The crystal face-to-face diameter and axial field of view are 6.0 cm and 6.5 mm, respectively. Bias voltage is applied to each SiPM using a finely controlled voltage supply because the gain of the SiPM strongly depends on the supply voltage. The physical characteristics were studied by measuring energy resolution, sensitivity, and spatial resolution. Various mouse and rat images were obtained to study the feasibility of the SiPM PET system in in vivo animal studies. Reconstructed PET images using a maximum-likelihood expectation maximization algorithm were coregistered with animal CT images. All individual LGSO crystals within the detectors were clearly distinguishable in flood images obtained by irradiating the detector using a (22)Na point source. The energy resolution for individual crystals was 25.8% ± 2.6% on average for 511-keV photopeaks. The spatial resolution measured with the (22)Na point source in a warm background was 1.0 mm (2 mm off-center) and 1.4 mm (16 mm off-center) when the maximum-likelihood expectation maximization algorithm was applied. A myocardial (18)F-FDG study in mice and a skeletal (18)F study in rats demonstrated the fine spatial resolution of the scanner. The feasibility of the SiPM PET system was also confirmed in the tumor images of mice using (18)F-FDG and (68)Ga-RGD and in the

  9. In-Situ Characterization of Potential-Induced Degradation in Crystalline Silicon Photovoltaic Modules Through Dark I–V Measurements

    DOE PAGES

    Luo, Wei; Hacke, Peter; Singh, Jai Prakash; ...

    2017-01-01

    A temperature correction methodology for in-situ dark I-V(DIV) characterization of conventional p-type crystalline silicon photovoltaic (PV) modules undergoing potential-induced degradation (PID) is proposed.

  10. In-Situ Characterization of Potential-Induced Degradation in Crystalline Silicon Photovoltaic Modules Through Dark I–V Measurements

    SciTech Connect

    Luo, Wei; Hacke, Peter; Singh, Jai Prakash; Chai, Jing; Wang, Yan; Ramakrishna, Seeram; Aberle, Armin G.; Khoo, Yong Sheng

    2016-11-14

    Here, a temperature correction methodology for in-situ dark I-V(DIV) characterization of conventional p-type crystalline silicon photovoltaic (PV) modules undergoing potential-induced degradation (PID) is proposed.

  11. Photoconductivity of organic polymer films doped with porous silicon nanoparticles and ionic polymethine dyes

    SciTech Connect

    Davidenko, N. A. Skrichevsky, V. A.; Ishchenko, A. A.; Karlash, A. Yu.; Mokrinskaya, E. V.

    2009-05-15

    Features of electrical conductivity and photoconductivity of polyvinylbutyral films containing porous silicon nanoparticles and similar films doped with cationic and anionic polymethine dyes are studied. Sensitization of the photoelectric effect by dyes with different ionicities in films is explained by the possible photogeneration of holes and electrons from dye molecules and the intrinsic bipolar conductivity of porous silicon nanoparticles. It is assumed that the electronic conductivity in porous silicon nanoparticles is higher in comparison with p-type conductivity.

  12. Analysis of thin layer optical properties of A-Si:H P-Type doping CH4 and P-Type without CH4 is deposited PECVD systems

    NASA Astrophysics Data System (ADS)

    Prayogi, Soni; Ayunis; Kresna; Cahyono, Yoyok; Akidah; Darminto

    2017-05-01

    The study of a thin layer growth of hydrogenated amorphous silicon (a-Si: H) using the technique of plasma enhancing chemical vapor deposition (PECVD) has been conducted. Material a-Si: H is one type of materials that is applied as solar cells. In this study, a thin layer of a-Si: H grown on glass substrates by using CH4 and without CH4. Most sources Si gas were used in silane gas (SiH4) 20% dissolved in hydrogen gas (H2). The addition of CH4 gas greatly affects the structure of layer morphology and energy gap in thin layers. Based on the results of characterization using AFM, it was obtained a layer thickness which was added by CH4 100 nm and layer thickness of 45 nm without CH4. While the optical energy band gap were conducted, based on the data from characterization using UV-Vis in the wavelength range of 400-800 nm, it was obtained layer optical energy band gap added by CH4 that was 1,95 eV and layer without CH4 that was 1.89 eV.

  13. Temperature Dependent Tensile Fracture Stress of n- and p-Type Filled-Skutterudite Materials

    SciTech Connect

    Salvador, James R.; Yang, Jihui; Wereszczak, Andrew A; Wang, Hsin; Cho, Jung Y

    2011-01-01

    While materials with excellent thermoelectric performance are most desirable for higher heat to electrical energy conversion efficiency, thermoelectric materials must also be sufficiently mechanically robust to withstand the large number of thermal cycles and vibrational stresses likely to be encountered while in service, particularly in automotive applications. Further these TE materials should be composed of non-toxic and naturally abundant constituent elements and be available as both n- and p-type varieties. Skutterudite based thermoelectric materials seemingly fit this list of criteria. In this contribution we report on the synthesis, tensile fracture strengths, low temperature electrical and thermal transport properties, and coefficients of thermal expansion (CTE), of the n-type skutterudite La{sub 0.05({+-}0.01)}Ba{sub 0.07({+-}0.04)}Yb{sub 0.08({+-}0.02)}Co{sub 4.00({+-}0.01)}Sb{sub 12.02({+-}0.03)} and the p-type Ce{sub 0.30({+-}0.02)}Co{sub 2.57({+-}0.02)}Fe{sub 1.43({+-}0.02)}Sb{sub 11.98({+-}0.03)}. Both materials have tensile fracture strengths that are temperature independent up to 500 C, and are in the range of {approx}140 MPa as measured by a three point bend flexure test fixture described herein. The CTE's were measured by dual rod dilatometry and were determined to be 10.3 ppm/C for the n-type material and 11.5 ppm/C for p-type up to 450 C.

  14. Semiconducting p-type MgNiO:Li epitaxial films fabricated by cosputtering method

    SciTech Connect

    Kwon, Yong Hun; Chun, Sung Hyun; Cho, Hyung Koun

    2013-07-15

    Li-doped ternary Mg{sub x}Ni{sub 1-x}O thin films were deposited on (0001) Al{sub 2}O{sub 3} substrates by a radio frequency (RF) magnetron cosputtering method with MgO and NiO:Li targets. The Mg mole fraction and Li content were relatively controlled by changing RF power for the MgO target over a range of 0-300 W, while the NiO:Li target was kept at 150 W. As a result, all films were epitaxially grown on (0001) Al{sub 2}O{sub 3} substrates with the relationship of [110]{sub NiO}||[1110]{sub Al2O3}, [112]{sub NiO}||[2110]{sub Al2O3} (in-plane), and [111]{sub NiO}||[0001]{sub Al2O3} (out-of-plane), and showed p-type semiconducting properties. Furthermore, from x-ray diffraction patterns, the authors found that MgO was effectively mixed with NiO:Li without structural deformation due to low lattice mismatch (0.8%) between NiO and MgO. However, the excess Li contents degraded the crystallinity of the MgNiO films. The band-gap of films was continuously shifted from 3.66 eV (339 nm) to 4.15 eV (299 nm) by the RF power of the MgO target. A visible transmittance of more than 80% was exhibited at RF powers higher than 200 W. Ultimately, the electrical resistivity of p-type MgNiO films was improved from 7.5 to 673.5 {Omega}cm, indicating that the Li-doped MgNiO films are good candidates for transparent p-type semiconductors.

  15. Above bandgap luminescence of p-type GaAs epitaxial layers

    NASA Astrophysics Data System (ADS)

    Sapriel, J.; Chavignon, J.; Alexandre, F.; Azoulay, R.; Sermage, B.; Rao, K.; Voos, M.

    1991-08-01

    New photoluminescence bands are observed in p-type GaAs epitaxial layers at 300 and 80 K, above the bandgap. These bands are independent of the nature of the dopant (Zn, Be, C) and of the growth technique (MBE or MOCVD). Their intensities increase as a function of the p doping (1 × 10 17 < p < 2 × 10 20cm-3) and peak at energies which correspond to transitions between the Γ 6, L 6 and X 6 minima of the conduction band and the Γ 8 and Γ 7 maxima of the valence band.

  16. Infrared analysis of hole properties of Mg-doped p-type InN films

    SciTech Connect

    Fujiwara, Masayuki; Ishitani, Yoshihiro; Wang Xinqiang; Che, Song-Bek; Yoshikawa, Akihiko

    2008-12-08

    Mg-doped InN films grown by plasma-assisted molecular beam epitaxy were characterized by infrared reflectance. Signatures of p-type conductivity in the spectra were obtained in the same doping density range where the existence of net acceptors was found by electrolyte capacitance-voltage measurements. Numerical spectrum analysis, which takes into account the large broadening factor of the normal mode energies of longitudinal optical phonon-plasmon coupling yielded high hole densities in the range of (0.1-1.2)x10{sup 19} cm{sup -3} and optical mobilities in the range of 25-70 cm{sup 2}/V s.

  17. Homojunction photodiodes based on Sb-doped p-type ZnO for ultraviolet detection

    NASA Astrophysics Data System (ADS)

    Mandalapu, L. J.; Yang, Z.; Xiu, F. X.; Zhao, D. T.; Liu, J. L.

    2006-02-01

    ZnO-based p-n homojunctions were grown using molecular-beam epitaxy. Sb and Ga were used as dopants to achieve the p-type and n-type ZnO, respectively. The mesa devices were fabricated by employing wet etching and standard photolithography techniques. Al /Ti metal was deposited by electron-beam evaporation and annealed to form Ohmic contacts. Current-voltage measurements of the device showed good rectifying behavior, from which a turn-on voltage of about 2V was obtained. Very good response to ultraviolet light illumination was observed from photocurrent measurements.

  18. Development of Materials and Structures for p-type Contacts in Cadmium Telluride Solar Cells

    NASA Astrophysics Data System (ADS)

    Ferizovic, Dino

    Solar cells based on CdTe absorbers are attractive due to the optimal direct band gap energy and large absorption coefficient of CdTe, however, their performance and commercialization is hindered by the lack of reliable p-type contacts. CdTe has a low carrier concentration and a large electron affinity, which results in a requirement of non-realistic work functions for metals to be used as back contacts in the solar cell. Even noble metals such as Ag present a significantly large potential barrier for holes, thereby reducing the hole current through the semiconductor/metal interface. Several attempts to resolve this challenge have been tried, however, many drawbacks have been encountered. Two particular systems, namely Cu2Te thin films and CdTe/ZnTe strained-layer superlattices, are investigated for their potential use as ohmic contacts in CdTe solar cells. A detailed analysis of the optical, electrical, and structural properties of Cu2Te thin films deposited by magnetron sputtering is presented. It is shown that these films have an indirect band gap and highly degenerate semiconductor behavior. The large p-type carrier concentration of Cu2Te films is highly desirable for the application of Cu2Te as a p-type contact to CdTe. In-depth studies of optical transitions and miniband transport in strained-layer CdTe/ZnTe superlattices are presented as well. The band offsets between CdTe and ZnTe were determined by comparison of measured and calculated optical transitions. Superlattice structures that offer best contact performance have been identified by use of tunneling probability simulations. Characterization of CdTe solar cells with above mentioned contacts indicated that contacts based on CdTe/ZnTe superlattices are a viable Cu free option for stable and reliable p-type contacts in CdTe solar cell. The contact performance of Cu2Te thin films was comparable to that of CdTe/ZnTe superlattices and both demonstrated an advantage over contacts based on ZnTe:N thin films

  19. Elastic constants determined by nanoindentation for p-type thermoelectric half-Heusler

    SciTech Connect

    Gahlawat, S.; Wheeler, L.; White, K. W. E-mail: kwwhite@uh.edu; He, R.; Chen, S.; Ren, Z. F. E-mail: kwwhite@uh.edu

    2014-08-28

    This paper presents a study of the elastic properties of the p-type thermoelectric half-Heusler material, Hf{sub 0.44}Zr{sub 0.44}Ti{sub 0.12}CoSb{sub 0.8}Sn{sub 0.2}, using nanoindentation. Large grain-sized polycrystalline specimens were fabricated for these measurements, providing sufficient indentation targets within single grains. Electron Backscatter Diffraction methods indexed the target grains for the correlation needed for our elastic analysis of individual single crystals for this cubic thermoelectric material. Elastic properties, including the Zener ratio and the Poisson ratio, obtained from the elasticity tensor are also reported.

  20. Solid state p-type dye-sensitized solar cells: concept, experiment and mechanism.

    PubMed

    Zhang, Lei; Boschloo, Gerrit; Hammarström, Leif; Tian, Haining

    2016-02-21

    Solid state p-type dye-sensitized solar cells (p-ssDSCs) have been proposed and fabricated for the first time, using the organic dye P1 as the sensitizer on mesoporous NiO and phenyl-C61-butyric acid methyl ester (PCBM) as the electron conductor. The p-ssDSC has shown an impressive open circuit photovoltage of 620 mV. Femtosecond and nanosecond transient absorption spectroscopy has given evidence for sub-ps hole injection from the excited P1 to NiO, followed by electron transfer from P1˙(-) to PCBM.

  1. Does p-type ohmic contact exist in WSe2-metal interfaces?

    NASA Astrophysics Data System (ADS)

    Wang, Yangyang; Yang, Ruo Xi; Quhe, Ruge; Zhong, Hongxia; Cong, Linxiao; Ye, Meng; Ni, Zeyuan; Song, Zhigang; Yang, Jinbo; Shi, Junjie; Li, Ju; Lu, Jing

    2015-12-01

    Formation of low-resistance metal contacts is the biggest challenge that masks the intrinsic exceptional electronic properties of two dimensional WSe2 devices. We present the first comparative study of the interfacial properties between monolayer/bilayer (ML/BL) WSe2 and Sc, Al, Ag, Au, Pd, and Pt contacts by using ab initio energy band calculations with inclusion of the spin-orbital coupling (SOC) effects and quantum transport simulations. The interlayer coupling tends to reduce both the electron and hole Schottky barrier heights (SBHs) and alters the polarity for the WSe2-Au contact, while the SOC chiefly reduces the hole SBH. In the absence of the SOC, the Pd contact has the smallest hole SBH. Dramatically, the Pt contact surpasses the Pd contact and becomes the p-type ohmic or quasi-ohmic contact with inclusion of the SOC. Therefore, p-type ohmic or quasi-ohmic contact exists in WSe2-metal interfaces. Our study provides a theoretical foundation for the selection of favorable metal electrodes in ML/BL WSe2 devices.Formation of low-resistance metal contacts is the biggest challenge that masks the intrinsic exceptional electronic properties of two dimensional WSe2 devices. We present the first comparative study of the interfacial properties between monolayer/bilayer (ML/BL) WSe2 and Sc, Al, Ag, Au, Pd, and Pt contacts by using ab initio energy band calculations with inclusion of the spin-orbital coupling (SOC) effects and quantum transport simulations. The interlayer coupling tends to reduce both the electron and hole Schottky barrier heights (SBHs) and alters the polarity for the WSe2-Au contact, while the SOC chiefly reduces the hole SBH. In the absence of the SOC, the Pd contact has the smallest hole SBH. Dramatically, the Pt contact surpasses the Pd contact and becomes the p-type ohmic or quasi-ohmic contact with inclusion of the SOC. Therefore, p-type ohmic or quasi-ohmic contact exists in WSe2-metal interfaces. Our study provides a theoretical foundation for

  2. n/p-Type changeable semiconductor TiO2 prepared from NTA

    NASA Astrophysics Data System (ADS)

    Li, Qiuye; Wang, Xiaodong; Jin, Zhensheng; Yang, Dagang; Zhang, Shunli; Guo, Xinyong; Yang, Jianjun; Zhang, Zhijun

    2007-10-01

    A novel kind of nano-sized TiO2 (anatase) was obtained by high-temperature (400-700°C) dehydration of nanotube titanic acid (H2Ti2O4(OH)2, NTA). The high-temperature (400-700°C) dehydrated nanotube titanic acids (HD-NTAs) with a unique defect structure exhibited a p-type semiconductor behavior under visible-light irradiation (λ≥420 nm, E photon=2.95 eV), whereas exhibited an n-type semiconductor behavior irradiated with UV light (λ=365 nm, E photon=3.40 eV).

  3. Apparatus for making molten silicon

    NASA Technical Reports Server (NTRS)

    Levin, Harry (Inventor)

    1988-01-01

    A reactor apparatus (10) adapted for continuously producing molten, solar grade purity elemental silicon by thermal reaction of a suitable precursor gas, such as silane (SiH.sub.4), is disclosed. The reactor apparatus (10) includes an elongated reactor body (32) having graphite or carbon walls which are heated to a temperature exceeding the melting temperature of silicon. The precursor gas enters the reactor body (32) through an efficiently cooled inlet tube assembly (22) and a relatively thin carbon or graphite septum (44). The septum (44), being in contact on one side with the cooled inlet (22) and the heated interior of the reactor (32) on the other side, provides a sharp temperature gradient for the precursor gas entering the reactor (32) and renders the operation of the inlet tube assembly (22) substantially free of clogging. The precursor gas flows in the reactor (32) in a substantially smooth, substantially axial manner. Liquid silicon formed in the initial stages of the thermal reaction reacts with the graphite or carbon walls to provide a silicon carbide coating on the walls. The silicon carbide coated reactor is highly adapted for prolonged use for production of highly pure solar grade silicon. Liquid silicon (20) produced in the reactor apparatus (10) may be used directly in a Czochralski or other crystal shaping equipment.

  4. Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches

    NASA Astrophysics Data System (ADS)

    Pawlik, Matthieu; Vilcot, Jean-Pierre; Halbwax, Mathieu; Gauthier, Michel; Le Quang, Nam

    2015-08-01

    The development of an efficient surface passivation is a key feature of silicon solar cells towards the improvement of €/W ratio. An Al2O3 layer coated by plasma-enhanced atomic layer deposition has proven its efficiency to increase the minority carrier lifetime on p-type silicon. However, the firing step, which is a common part of the manufacturing process that includes metallic pastes for screen-printed contacts, ruins this passivation effect. On the basis of photoelectric, electric, and chemical experimental studies, a correlation is provided in this paper between the different microscopic and macroscopic behaviors that govern the passivation process. To show this correlation, photoconductance decay measurements have been carried out to determine minority carrier lifetime. Following which, the capacitance-voltage measurement results are used to extract electrical parameters, namely, the densities of interface defects and effective charges. In addition, complementing secondary ion mass spectrometry (SIMS) experiments revealed the different chemical species that can be relevant for the explanation of passivation quality and macroscopic electrical measurements.

  5. Electrical characteristics of amorphous iron-tungsten contacts on silicon

    NASA Technical Reports Server (NTRS)

    Finetti, M.; Pan, E. T.-S.; Nicolet, M.-A.; Suni, I.

    1983-01-01

    The electrical characteristics of amorphous Fe-W contacts have been determined on both p-type and n-type silicon. The amorphous films were obtained by cosputtering from a composite target. Contact resistivities of 1 x 10 to the -7th and 2.8 x 10 to the -6th were measured on n(+) and p(+) silicon, respectively. These values remain constant after thermal treatment up to at least 500 C. A barrier height of 0.61 V was measured on n-type silicon.

  6. Recombination activity of copper in silicon

    NASA Astrophysics Data System (ADS)

    Sachdeva, R.; Istratov, A. A.; Weber, E. R.

    2001-10-01

    The carrier recombination activity of copper in n-type and p-type silicon has been investigated. The minority carrier diffusion length has been found to decrease monotonically with increasing copper concentration in n Si and to exhibit a step-like behavior in p-type silicon at Cu concentrations above a certain critical level. It is suggested that the impact of copper on the minority carrier diffusion length is determined by the formation of copper precipitates. This process is retarded in perfect silicon due to the large lattice mismatch between Cu3Si and the silicon lattice and even more retarded in p Si, due to electrostatic repulsion effects between the positively charged copper precipitates and interstitial copper ions. Comparison of the impact of Cu on minority carrier diffusion length obtained with p-Si samples of different resistivity confirmed the electrostatic model. Studies of the impact of copper on minority carrier diffusion length in samples with internal gettering sites indicated that they provide heterogeneous nucleation sites for Cu precipitation at subcritical Cu concentration. Above a certain threshold of Cu concentration, the bulk recombination activity is dominated by quasihomogeneous formation of Cu precipitates, a process that is not detectably affected by the presence of oxide precipitates.

  7. Easily doped p-type, low hole effective mass, transparent oxides

    NASA Astrophysics Data System (ADS)

    Sarmadian, Nasrin; Saniz, Rolando; Partoens, Bart; Lamoen, Dirk

    2016-02-01

    Fulfillment of the promise of transparent electronics has been hindered until now largely by the lack of semiconductors that can be doped p-type in a stable way, and that at the same time present high hole mobility and are highly transparent in the visible spectrum. Here, a high-throughput study based on first-principles methods reveals four oxides, namely X2SeO2, with X = La, Pr, Nd, and Gd, which are unique in that they exhibit excellent characteristics for transparent electronic device applications - i.e., a direct band gap larger than 3.1 eV, an average hole effective mass below the electron rest mass, and good p-type dopability. Furthermore, for La2SeO2 it is explicitly shown that Na impurities substituting La are shallow acceptors in moderate to strong anion-rich growth conditions, with low formation energy, and that they will not be compensated by anion vacancies VO or VSe.

  8. Imperceptible and Ultraflexible p-Type Transistors and Macroelectronics Based on Carbon Nanotubes.

    PubMed

    Cao, Xuan; Cao, Yu; Zhou, Chongwu

    2016-01-26

    Flexible thin-film transistors based on semiconducting single-wall carbon nanotubes are promising for flexible digital circuits, artificial skins, radio frequency devices, active-matrix-based displays, and sensors due to the outstanding electrical properties and intrinsic mechanical strength of carbon nanotubes. Nevertheless, previous research effort only led to nanotube thin-film transistors with the smallest bending radius down to 1 mm. In this paper, we have realized the full potential of carbon nanotubes by making ultraflexible and imperceptible p-type transistors and circuits with a bending radius down to 40 μm. In addition, the resulted transistors show mobility up to 12.04 cm(2) V(-1) S(-1), high on-off ratio (∼10(6)), ultralight weight (<3 g/m(2)), and good mechanical robustness (accommodating severe crumpling and 67% compressive strain). Furthermore, the nanotube circuits can operate properly with 33% compressive strain. On the basis of the aforementioned features, our ultraflexible p-type nanotube transistors and circuits have great potential to work as indispensable components for ultraflexible complementary electronics.

  9. EEG/MEG forward simulation through h- and p-type finite elements

    NASA Astrophysics Data System (ADS)

    Pursiainen, S.

    2008-07-01

    Electro/Magnetoencephalography (EEG/MEG) is a non-invasive imaging modality, in which a primary current density generated by the neural activity in the brain is to be reconstructed from external electric potential/magnetic field measurements. This work focuses on effective and accurate simulation of the EEG/MEG forward model through the h- and p-versions of the finite element method (h- and p-FEM). The goal is to compare the effectiveness of these two versions in forward simulation. Both h- and p-type forward simulations are described and implemented, and the technical solutions found are discussed. These include, for example, suitable ways to generate a finite element mesh for a real head geometry through the use of different element types. Performances of the two implemented forward simulation types are compared by measuring directly the forward modeling error, as well as by computing reconstructions through a regularized FOCUSS (FOCal Underdetermined System Solver) algorithm. The results obtained suggest that the p-type performs better in terms of the forward modeling error. However, both types perform well in regularized FOCUSS reconstruction.

  10. Fullerene C{sub 70} as a p-type donor in organic photovoltaic cells

    SciTech Connect

    Zhuang, Taojun; Wang, Xiao-Feng E-mail: zrhong@ucla.edu Sano, Takeshi; Kido, Junji E-mail: zrhong@ucla.edu; Hong, Ziruo E-mail: zrhong@ucla.edu; Li, Gang; Yang, Yang

    2014-09-01

    Fullerenes and their derivatives have been widely used as n-type materials in organic transistor and photovoltaic devices. Though it is believed that they shall be ambipolar in nature, there have been few direct experimental proofs for that. In this work, fullerene C{sub 70}, known as an efficient acceptor, has been employed as a p-type electron donor in conjunction with 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile as an electron acceptor in planar-heterojunction (PHJ) organic photovoltaic (OPV) cells. High fill factors (FFs) of more than 0.70 were reliably achieved with the C{sub 70} layer even up to 100 nm thick in PHJ cells, suggesting the superior potential of fullerene C{sub 70} as the p-type donor in comparison to other conventional donor materials. The optimal efficiency of these unconventional PHJ cells was 2.83% with a short-circuit current of 5.33 mA/cm{sup 2}, an open circuit voltage of 0.72 V, and a FF of 0.74. The results in this work unveil the potential of fullerene materials as donors in OPV devices, and provide alternative approaches towards future OPV applications.

  11. Carrier induced local moment magnetization in p-type Sn1-xMnxTe

    NASA Astrophysics Data System (ADS)

    Behera, Sashi S.; Tripathi, Pratibha; Nayak, Sanjeev K.; Tripathi, Gouri S.

    2017-08-01

    We derive a theory of carrier induced local moment magnetization of p-type Sn1-xMnxTe based on the Hubbard model, k → · π → electronic structure method (k → is the electronic wave vector and π → is the relativistic momentum operator) and the statistical paramagnetic approach for the localized moments. The Hubbard model is used to derive an internal exchange magnetic field. The difference in exchange self-energy is expressed in terms of an internal exchange field that is proportional to the parameter U, the onsite Coulomb repulsion, and the spin-density of carriers. In the present theory, the k → · π → + U model is integrated with the statistical paramagnetic theory for localized spins, which is then solved in a self-consistent manner by adding the exchange field to the applied field. The technique is applied to study the magnetic properties of p-type Sn1-xMnxTe, an important material for spintronics devices. The local moment magnetization calculated using the total magnetic field self-consistently agrees with the experimental observations. Magnetization and the exchange field studied as functions of the applied field, temperature and carrier concentration yield results on expected lines. Ours is a mechanism that is different from the RKKY interaction, normally invoked for carrier induced ferromagnetism and is thus a novelty.

  12. Conducting mechanism in the epitaxial p -type transparent conducting oxide C r2O3:Mg

    NASA Astrophysics Data System (ADS)

    Farrell, L.; Fleischer, K.; Caffrey, D.; Mullarkey, D.; Norton, E.; Shvets, I. V.

    2015-03-01

    Epitaxial p -type transparent conducting oxide (TCO) C r2O3:Mg was grown by electron-beam evaporation in a molecular beam epitaxy system on c -plane sapphire. The influence of Mg dopants and the oxygen partial pressure were investigated by thermoelectric and electrical measurements. The conduction mechanism is analyzed using the small-polaron hopping model, and hopping activation energies have been determined, which vary with doping concentration in the range of 210-300 ± 5 meV. Films with better conductivity were obtained by postannealing. The effect of postannealing is discussed in terms of a crystallographic reordering of the Mg dopant. The highest Seebeck mobilities obtained from thermoelectric measurements are of the order of 10-4cm2V-1s-1 . We investigate the fundamental properties of a Mg dopant in a high crystalline quality epitaxial film of a binary oxide, helping us understand the role of short range crystallographic order in a p -type TCO in detail.

  13. Easily doped p-type, low hole effective mass, transparent oxides

    PubMed Central

    Sarmadian, Nasrin; Saniz, Rolando; Partoens, Bart; Lamoen, Dirk

    2016-01-01

    Fulfillment of the promise of transparent electronics has been hindered until now largely by the lack of semiconductors that can be doped p-type in a stable way, and that at the same time present high hole mobility and are highly transparent in the visible spectrum. Here, a high-throughput study based on first-principles methods reveals four oxides, namely X2SeO2, with X = La, Pr, Nd, and Gd, which are unique in that they exhibit excellent characteristics for transparent electronic device applications – i.e., a direct band gap larger than 3.1 eV, an average hole effective mass below the electron rest mass, and good p-type dopability. Furthermore, for La2SeO2 it is explicitly shown that Na impurities substituting La are shallow acceptors in moderate to strong anion-rich growth conditions, with low formation energy, and that they will not be compensated by anion vacancies VO or VSe. PMID:26854336

  14. Tailoring of the Metal-N/P-Type GaSb Interface Properties for Device Production

    SciTech Connect

    Varblianska, K.; Tzeneva, S.; Comninou, Ph.; Nihtianova, D.

    2007-04-23

    There are some difficulties in producing Schottky barriers (SB) to p-type GaSb and ohmic contacts (OC) to n-type GaSb connected with the physical nature of the GaSb itself. By applying low energy Ar ion sputtering at 200-700V and (NH4)2S solution treatment of the p-type substrates we achieved a rectifying behavior of the p-GaSb/Pd contacts. The same procedure combined with a proper annealing led to the production of good n-GaSb/Pd/Ge/Au ohmic contacts. The electrical behavior of the SB and OC is inferred from their current-voltage characteristics on specially prepared diode structures. SEM and TEM investigations are conducted to specify the surface and interface reactions during the processing. We interpret these results in terms of the generation of such a Ga to Sb vacancy concentration ratio during the ion sputtering that enhances the incorporation of Ge and S as donor impurities in the GaSb surface.

  15. Valence Band Structure of Highly Efficient p-type Thermoelectric PbTe-PbS Alloys

    SciTech Connect

    Jaworski, C. M.; Nielsen, Mechele; Wang, Hsin; Girard, Steven N.; Cai, Wei; Porter, Wallace D; Kanatzidis, Mercouri G.; Heremans, J. P.

    2013-01-01

    New experimental evidence is given relevant to the temperature-dependence of valence band structure of PbTe and PbTe1-xSx alloys (0.04 x 0.12), and its effect on the thermoelectric figure of merit zT. The x = 0.08 sample has zT ~ 1.55 at 773K. The magnetic field dependence of the high-temperature Hall resistivity of heavily p-type (> 1019 cm-3) Na-doped PbTe1-xSx reveals the presence of high-mobility electrons. This put in question prior analyses of the Hall coefficient and the conclusion that PbTe would be an indirect gap semiconductor at temperatures where its zT is optimal. Possible origins for these electrons are discussed: they can be induced by photoconductivity, or by the topology of the Fermi surface when the L and -bands merge. Negative values for the low-temperature thermopower are also observed. Our data show that PbTe continues to be a direct gap semiconductor at temperatures where the zT and S2 of p-type PbTe are optimal e.g. 700-900K. The previously suggested temperature induced rapid rise in energy of the heavy hole LVB relative to the light hole UVB is not supported by the experimental data.

  16. Perovskite LaRhO3 as a p-type active layer in oxide photovoltaics

    NASA Astrophysics Data System (ADS)

    Nakamura, Masao; Krockenberger, Yoshiharu; Fujioka, Jun; Kawasaki, Masashi; Tokura, Yoshinori

    2015-02-01

    Perovskite-type transition-metal oxides have a wide variety of physical properties and triggered intensive research on functional devices in the form of heteroepitaxial junctions. However, there is a missing component that is a p-type conventional band semiconductor. LaRhO3 (LRO) is one of very few promising candidates having its bandgap between filled t2g and empty eg of Rh in low-spin state, but there has been no report on the synthesis of large-size single crystals or thin films. Here, we report on the junction properties of single-crystalline thin films of LRO grown on (110) oriented Nb-doped SrTiO3 substrates. The external quantum efficiency of the photo-electron conversion exceeds 1% in the visible-light region due to the wide depletion layer and long diffusion length of minority carriers in LRO. Clear indication of p-type band semiconducting character in a perovskite oxide of LRO will pave a way to explore oxide electronics of perovskite heterostructures.

  17. p-Type Doping of GaN Nanowires Characterized by Photoelectrochemical Measurements.

    PubMed

    Kamimura, Jumpei; Bogdanoff, Peter; Ramsteiner, Manfred; Corfdir, Pierre; Feix, Felix; Geelhaar, Lutz; Riechert, Henning

    2017-03-08

    GaN nanowires (NWs) doped with Mg as a p-type impurity were grown on Si(111) substrates by plasma-assisted molecular beam epitaxy. In a systematic series of experiments, the amount of Mg supplied during NW growth was varied. The incorporation of Mg into the NWs was confirmed by the observation of donor-acceptor pairs and acceptor-bound excitons in low-temperature photoluminescence spectroscopy. Quantitative information about the Mg concentrations was deduced from Raman scattering by local vibrational modes related to Mg. In order to study the type and density of charge carriers present in the NWs, we employed two photoelectrochemical techniques, open-circuit potential and Mott-Schottky measurements. Both methods showed the expected transition from n-type to p-type conductivity with increasing Mg doping level, and the latter characterization technique allowed us to quantify the charge carrier concentration. Beyond the quantitative information obtained for Mg doping of GaN NWs, our systematic and comprehensive investigation demonstrates the benefit of photoelectrochemical methods for the analysis of doping in semiconductor NWs in general.

  18. Impurity Resonant States p-type Doping in Wide-Band-Gap Nitrides

    PubMed Central

    Liu, Zhiqiang; Yi, Xiaoyan; Yu, Zhiguo; Yuan, Gongdong; Liu, Yang; Wang, Junxi; Li, Jinmin; Lu, Na; Ferguson, Ian; Zhang, Yong

    2016-01-01

    In this work, a new strategy for achieving efficient p-type doping in high bandgap nitride semiconductors to overcome the fundamental issue of high activation energy has been proposed and investigated theoretically, and demonstrated experimentally. Specifically, in an AlxGa1−xN/GaN superlattice structure, by modulation doping of Mg in the AlxGa1−xN barriers, high concentration of holes are generated throughout the material. A hole concentration as high as 1.1 × 1018 cm−3 has been achieved, which is about one order of magnitude higher than that typically achievable by direct doping GaN. Results from first-principle calculations indicate that the coupling and hybridization between Mg 2p impurity and the host N 2p orbitals are main reasons for the generation of resonant states in the GaN wells, which further results in the high hole concentration. We expect this approach to be equally applicable for other high bandgap materials where efficient p-type doing is difficult. Furthermore, a two-carrier-species Hall-effect model is proposed to delineate and discriminate the characteristics of the bulk and 2D hole, which usually coexist in superlattice-like doping systems. The model reported here can also be used to explain the abnormal freeze-in effect observed in many previous reports. PMID:26777294

  19. Deep levels generated by thermal oxidation in p-type 4H-SiC

    SciTech Connect

    Kawahara, Koutarou; Suda, Jun; Kimoto, Tsunenobu

    2013-01-21

    Thermal oxidation is an effective method to reduce deep levels, especially the Z{sub 1/2}-center (E{sub C}-0.67 eV), which strongly suppresses carrier lifetimes in n-type 4H-SiC epilayers. The oxidation, however, simultaneously generates other deep levels, HK0 (E{sub V}+0.79 eV) and HK2 (E{sub V}+0.98 eV) centers, within the lower half of the bandgap of SiC, where the HK0 center is a dominant deep level with a concentration of about 1 Multiplication-Sign 10{sup 13} cm{sup -3} after oxidation. By comparing deep levels observed in three sets of p-type 4H-SiC: oxidized, electron-irradiated, and C{sup +}- or Si{sup +}-implanted samples, we find that the HK0 and HK2 centers are complexes including carbon interstitials such as the di-carbon interstitial or di-carbon antisite. Other defects observed in p-type 4H-SiC after electron irradiation or after C{sup +}/Si{sup +} implantation are also studied.

  20. Silicon microdosimetry.

    PubMed

    Agosteo, Stefano; Pola, Andrea

    2011-02-01

    Silicon detectors are being studied as microdosemeters since they can provide sensitive volumes of micrometric dimensions. They can be applied for assessing single-event effects in electronic instrumentation exposed to complex fields around high-energy accelerators or in space missions. When coupled to tissue-equivalent converters, they can be used for measuring the quality of radiation therapy beams or for dosimetry. The use of micrometric volumes avoids the contribution of wall effects to the measured spectra. Further advantages of such detectors are their compactness, cheapness, transportability and a low sensitivity to vibrations. The following problems need to be solved when silicon devices are used for microdosimetry: (i) the sensitive volume has to be confined in a region of well-known dimensions; (ii) the electric noise limits the minimum detectable energy; (iii) corrections for tissue-equivalency should be made; (iv) corrections for shape equivalency should be made when referring to a spherical simulated site of tissue; (v) the angular response should be evaluated carefully; (vi) the efficiency of a single detector of micrometric dimensions is very poor and detector arrays should be considered. Several devices have been proposed as silicon microdosemeters, based on different technologies (telescope detectors, silicon on insulator detectors and arrays of cylindrical p-n junctions with internal amplification), in order to satisfy the issues mentioned above.

  1. Inverse Design of p-Type Transparent Conducting Oxides for Energy Applications

    NASA Astrophysics Data System (ADS)

    Nagaraja, Arpun Ramaiah

    The Inverse Design approach to materials discovery was applied to developing materials that exhibit simultaneous p-type conductivity and optical transparency. Theoretical calculations predicted that Rh2ZnO4 and Cr2MnO4, well-known compounds with the spinel crystal structure, had the potential to be p-type transparent conducting oxides (p-TCOs). Bulk samples of these materials were synthesized, and their structural, optical, and electrical properties were characterized. Theory predicted that Rh2ZnO4 was largely a line compound, with slight deviations toward Zn-excess at higher temperatures. This off-stoichiometry was predicted to be the source of excess holes and thus p-type conductivity in Rh2ZnO4. Additionally, new methods in density functional theory predicted that hole conduction in Rh 2ZnO4 occurred via band transport, instead of small polaron hopping. In this work, experimental X-ray diffraction (XRD) studies confirmed that Rh2ZnO4 exhibits small off-stoichiometry toward Zn-rich compositions at 975°C. High temperature electrical measurements confirmed p-type conductivity, and room temperature Hall effect measurements yielded a hole mobility of 0.18 cm2/Vs for a bulk polycrystalline sample. In order to distinguish between band and polaron conduction, a revised analysis for high temperature electrical data was developed. This new analysis combines conductivity and thermopower data with theoretical calculations of the effective density of states in order to determine the behavior of the mobility with temperature. This method can be applied in the absence of a direct measurement of the temperature-dependence of the mobility. The results of this new method indicate that the behavior of Rh2ZnO4 is consistent with band conduction. Although intrinsic Cr2MnO4 is electrically insulating, lithium was predicted to be an effective p-type dopant, occupying the tetrahedral (Mn) site. Combined neutron/X-ray measurements of a doped specimen confirmed the predicted site

  2. p-Type semiconducting nickel oxide as an efficiency-enhancing anodal interfacial layer in bulk heterojunction solar cells

    DOEpatents

    Irwin, Michael D; Buchholz, Donald B; Marks, Tobin J; Chang, Robert P. H.

    2014-11-25

    The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode, a p-type semiconductor layer formed on the anode, and an active organic layer formed on the p-type semiconductor layer, where the active organic layer has an electron-donating organic material and an electron-accepting organic material.

  3. Silicon surface passivation by silicon nitride deposition

    NASA Technical Reports Server (NTRS)

    Olsen, L. C.

    1984-01-01

    Silicon nitride deposition was studied as a method of passivation for silicon solar cell surfaces. The following three objectives were the thrust of the research: (1) the use of pecvd silicon nitride for passivation of silicon surfaces; (2) measurement techniques for surface recombination velocity; and (3) the importance of surface passivation to high efficiency solar cells.

  4. Method for enhancing the solubility of dopants in silicon

    DOEpatents

    Sadigh, Babak; Lenosky, Thomas J.; De La Rubia, Tomas Diaz

    2003-09-30

    A method for enhancing the equilibrium solid solubility of dopants in silicon, germanium and silicon-germanium alloys. The method involves subjecting silicon-based substrate to biaxial or compression strain. It has been determined that boron solubility was largely enhanced (more than 100%) by a compressive bi-axial strain, based on a size-mismatch theory since the boron atoms are smaller than the silicon atoms. It has been found that the large enhancement or mixing properties of dopants in silicon and germanium substrates is primarily governed by their, and to second order by their size-mismatch with the substrate. Further, it has been determined that the dopant solubility enhancement with strain is most effective when the charge and the size-mismatch of the impurity favor the same type of strain. Thus, the solid solubility of small p-type (e.g., boron) as well as large n-type (e.g., arsenic) dopants can be raised most dramatically by appropriate bi-axial (compressive) strain, and that solubility of a large p-type dopant (e.g, indium) in silicon will be raised due to size-mismatch with silicon, which favors tensile strain, while its negative charge prefers compressive strain, and thus the two effects counteract each other.

  5. Gate tunable graphene-silicon Ohmic/Schottky contacts

    NASA Astrophysics Data System (ADS)

    Chen, Chun-Chung; Chang, Chia-Chi; Li, Zhen; Levi, A. F. J.; Cronin, Stephen B.

    2012-11-01

    We show that the I-V characteristics of graphene-silicon junctions can be actively tuned from rectifying to Ohmic behavior by electrostatically doping the graphene with a polymer electrolyte gate. Under zero applied gate voltage, we observe rectifying I-V characteristics, demonstrating the formation of a Schottky junction at the graphene-silicon interface. Through appropriate gating, the Fermi energy of the graphene can be varied to match the conduction or valence band of silicon, thus forming Ohmic contacts with both n- and p-type silicon. Over the applied gate voltage range, the low bias conductance can be varied by more than three orders of magnitude. By varying the top gate voltage from -4 to +4 V, the Fermi energy of the graphene is shifted between -3.78 and -5.47 eV; a shift of ±0.85 eV from the charge neutrality point. Since the conduction and valence bands of the underlying silicon substrate lie within this range, at -4.01 and -5.13 eV, the Schottky barrier height and depletion width can be decreased to zero for both n- and p-type silicon under the appropriate top gating conditions. I-V characteristics taken under illumination show that the photo-induced current can be increased or decreased based on the graphene-silicon work function difference.

  6. One-dimensional strain initiated by rapid compaction of a heterogenous granular mixture consisting of copper, iron, silicon dioxide, carbon, molybdenum disulfide, and tin

    NASA Astrophysics Data System (ADS)

    Braun, Cullen A.

    The dynamic compaction of metal powders is of great interest to the metallurgical and military communities. The compaction of a heterogeneous granular mixture consisting of copper, iron, silica, graphite, molybdenum-disulfide, and tin predominately used in aviation break-pad creation is presented. The initial density of the material was on average 2.756 gcm3 . The research also required developing a working projectile velocity measurement system and a proper target assembly for pressure measurements. Manganin gages were used to record the shock wave transit time and the pressure of the transmitted waveform into the powder mixture. An impedance matching technique was utilized to determine the particle velocity at the powder-impact plate interface and the shock velocity was determined from the measured data. The shock velocity and particle velocity were plotted to develop a linear equation of state, Us = SUp + C0. The linear equation of state was determined to have a Hugoniot slope of S = 0.3949 +/- 1.2869 and a bulk sound speed of C0 = 0.552 +/- .188( m/s). The equation of state was then employed in bulk one-dimensional computer simulations to compare to the waveform obtained from the pressure measurement system. The post-impact samples were investigated using a scanning electron microscope and electron dispersive spectroscopy to compare the microstructure of the dynamically compacted samples to the commercially manufactured pressed and sintered sample. The bulk scale simulations proved to recreate the pressure waveform from the pressure measurement system. It was also found that the dynamically compressed samples had minimal evidence of sintered grains, but had significant lateral fractures resulting from release.

  7. First principles molecular dynamics studies of elastic constants, ideal tensile strength, chemistry of crack initiation, and surface and cohesive energies in amorphous silicon

    NASA Astrophysics Data System (ADS)

    Shodja, Hossein M.; Tabatabaei, Maryam; Esfarjani, Keivan

    2014-09-01

    First principles Kohn-Sham density functional theory (DFT)-based molecular dynamics (MD) is employed to investigate some physical and mechanical properties of amorphous Si (a-Si) samples, as-quenched and annealed containing dangling and floating bonds as well as distorted tetrahedral bonds. The total energy and true stress as functions of the engineering strain for a-Si samples subjected to uniaxial tensile stress as well as uniaxial extension are obtained. It is well-known that the electron density of the state of matters can be determined via ab initio DFT-based MD with high accuracy. Using this technique, such inherent properties as the elastic constants, ideal tensile strength, ultimate tensile strength, and surface and cohesive energies will be calculated. Since the employed ab initio MD, in contrast to the empirical potentials simulations, is capable of providing the evolution of the electronic charge distribution, we can afford to study the chemistry of crack initiation and reconstructed surfaces at final rupture. The calculated cohesive and surface energies are compared with the available theoretical and experimental results; Tyson's empirical relation and universal binding energy relations (UBERs) are also examined. The calculated elastic constants using the symmetry-general scheme satisfy well the isotropic relation ?. To date, the ab initio MD samples of a-Si generated from the completely melted scheme were all free of three-fold-coordinated Si. In contrast, as we will show, by implementing special thermal treatments, generation of all inherent structural defects is possible. Based on the electronic charge distribution, dative bonds and trigonal prisms for, respectively, floating and dangling bonds have been observed.

  8. Intravitreal properties of porous silicon photonic crystals

    PubMed Central

    Cheng, L; Anglin, E; Cunin, F; Kim, D; Sailor, M J; Falkenstein, I; Tammewar, A; Freeman, W R

    2009-01-01

    Aim To determine the suitability of porous silicon photonic crystals for intraocular drug-delivery. Methods A rugate structure was electrochemically etched into a highly doped p-type silicon substrate to create a porous silicon film that was subsequently removed and ultrasonically fractured into particles. To stabilise the particles in aqueous media, the silicon particles were modified by surface alkylation (using thermal hydrosilylation) or by thermal oxidation. Unmodified particles, hydrosilylated particles and oxidised particles were injected into rabbit vitreous. The stability and toxicity of each type of particle were studied by indirect ophthalmoscopy, biomicroscopy, tonometry, electroretinography (ERG) and histology. Results No toxicity was observed with any type of the particles during a period of >4 months. Surface alkylation led to dramatically increased intravitreal stability and slow degradation. The estimated vitreous half-life increased from 1 week (fresh particles) to 5 weeks (oxidised particles) and to 16 weeks (hydrosilylated particles). Conclusion The porous silicon photonic crystals showed good biocompatibility and may be used as an intraocular drug-delivery system. The intravitreal injectable porous silicon photonic crystals may be engineered to host a variety of therapeutics and achieve controlled drug release over long periods of time to treat chronic vitreoretinal diseases. PMID:18441177

  9. Commissioning and operation of the CDF silicon detector

    SciTech Connect

    S. D'Auria

    2002-01-18

    The CDF-II silicon detector has been partially commissioned and used for taking preliminary physics data. This paper is a report on commissioning and initial operations of the 5.8m{sup 2} silicon detector. This experience can be useful to the large silicon systems that are presently under construction.

  10. Effect of N- and P-Type Doping on the Oxygen-Binding Energy and Oxygen Spillover of Supported Palladium Clusters

    NASA Astrophysics Data System (ADS)

    Reber, Arthur C.; Khanna, Shiv N.

    2015-03-01

    The oxygen-binding energy is one of the primary factors determining catalytic activity in oxidation reactions. One strategy for controlling the binding of a reactant to a surface is to dope the surface to create complementary donor-acceptor pairs. As oxygen is an acceptor, we have investigated the effect of doping on the oxygen-binding energy on Pd atoms and clusters supported on a rutile TiO2(110) surface. We find that the P-type doping of the TiO2 surface dramatically reduces the O-binding energy to Pd. When extended to Pd4-supported clusters, we find that the P-type dopant decreases the energy for the oxygen to bind at spillover sites directly to the TiO2 surface. In Pd4O2, the oxygen-binding energy is reduced with P-type doping, suggesting that this strategy may be used to control the oxygen-binding energy to supported catalysts. This work was supported by the Air Force Office of Scientific Research (AFOSR) Basic Research Initiative Grant FA9550-12-1-0481.

  11. NbFeSb based p-type half-Heusler for power generation applications

    NASA Astrophysics Data System (ADS)

    Joshi, Giri; He, Ran; Engber, Michael; Samsonidze, Georgy; Pantha, Tej; Dahal, Ekraj; Dahal, Keshab; Yang, Jian; Lan, Yucheng; Kozinsky, Boris; Ren, Zhifeng

    2015-03-01

    We report a peak dimensionless figure-of-merit (ZT) of ~1 at 700 oC in nanostructured p-type Nb0.6Ti0.4FeSb0.95Sn0.05composition. Even though the power factor of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition is improved by 25% in comparison to the previously reported p-type Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2, the ZT value is not increased due to a higher thermal conductivity. However, the higher power factor of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition led to a 15% increase in power output of a thermoelectric device in comparison to a device made from the previous best material Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2. The n-type material used to make the unicouple device is the best reported nanostructured Hf0.25Zr0.75NiSn0.99Sb0.01 composition with the lowest hafnium (Hf) content. Both the p- and n-type nanostructured samples are prepared by ball milling the arc melted ingot and hot pressing the finely ground powders. Moreover, the raw material cost of the Nb0.6Ti0.4FeSb0.95Sn0.05 composition is more than six times lower compared to the cost of the previous best p-type Hf0.44Zr0.44Ti0.12CoSb0.8Sn0.2. This cost reduction is crucial for these materials to be used in large-scale quantities for vehicle and industrial waste heat recovery applications. DOE:DE-EE0004840.

  12. Purification and deposition of silicon by an iodide disproportionation reaction

    DOEpatents

    Wang, Tihu; Ciszek, Theodore F.

    2002-01-01

    Method and apparatus for producing purified bulk silicon from highly impure metallurgical-grade silicon source material at atmospheric pressure. Method involves: (1) initially reacting iodine and metallurgical-grade silicon to create silicon tetraiodide and impurity iodide byproducts in a cold-wall reactor chamber; (2) isolating silicon tetraiodide from the impurity iodide byproducts and purifying it by distillation in a distillation chamber; and (3) transferring the purified silicon tetraiodide back to the cold-wall reactor chamber, reacting it with additional iodine and metallurgical-grade silicon to produce silicon diiodide and depositing the silicon diiodide onto a substrate within the cold-wall reactor chamber. The two chambers are at atmospheric pressure and the system is open to allow the introduction of additional source material and to remove and replace finished substrates.

  13. Persistent Hydrogen Production by the Photo-Assisted Microbial Electrolysis Cell Using a p-Type Polyaniline Nanofiber Cathode.

    PubMed

    Jeon, Yongwon; Kim, Sunghyun

    2016-12-08

    A microbial electrolysis cell, though considered as a promising, environmentally friendly technology for hydrogen production, suffers from concomitant production of methane. The high hydrogen/methane ratio at the initial operation stage decreases with time. Here we report for the first time the photoassisted microbial electrolysis cell (MEC) for persistent hydrogen production using polyaniline nanofibers as a cathode. Under 0.8 V external bias and laboratory fluorescent light illumination in a single-chamber MEC, continuous hydrogen production from acetate at a rate of 1.78 mH2 (3)  m(-3)  d(-1) with 79.2 % overall hydrogen recovery was achieved with negligible methane formation for six months. Energy efficiencies based on input electricity as well as input electricity plus substrate were 182 and 66.2 %, respectively. This was attributed to the p-type-semiconductor characteristics of polyaniline nanofibers in which photoexcited electrons are used to reduce protons at the surface and holes are reduced with electrons originating from acetate oxidation at the anode. This method can be extended to microbial wastewater treatment for hydrogen production. © 2016 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

  14. Sol-gel production of p-type ZnO thin film by using sodium doping

    NASA Astrophysics Data System (ADS)

    Bu, Ian Y. Y.

    2016-08-01

    In this study, ZnO:Na thin films doped with 1-5 at.% of Na were synthesized on glass substrates by the sol-gel deposition technique. The morphology and optoelectronic properties of the thin films were characterized by using the environmental scanning electron microscope (SEM), X-ray diffraction (XRD), UV-Vis spectroscopy and Hall effect measurements. The SEM images and XRD pattern both indicated a substantial change in the film structure as the Na content increases due to the oversupply of the OH- ions in the initial precursor solution. UV-Vis spectroscopy measurements revealed that the increase in Na doping resulted in the decreases of the optical transmittance and the optical band gap due to the formation recombination centers. Hall effect measurements confirmed that the ZnO:Na films doped with >2 at.% of Na are stable with p-type conduction behaviour. As a demonstration, a ZnO-based junction was fabricated using the synthesized ZnO:Na/ZnO thin films on indium tin oxide glass substrates.

  15. Surface photovoltage studies of p-type AlGaN layers after reactive-ion etching

    NASA Astrophysics Data System (ADS)

    McNamara, J. D.; Phumisithikul, K. L.; Baski, A. A.; Marini, J.; Shahedipour-Sandvik, F.; Das, S.; Reshchikov, M. A.

    2016-10-01

    The surface photovoltage (SPV) technique was used to study the surface and electrical properties of Mg-doped, p-type AlxGa1-xN (0.06 < x < 0.17) layers. SPV measurements reveal significant deviation from previous SPV studies on p-GaN:Mg thin films and from the predictions of a thermionic model for the SPV behavior. In particular, the SPV of the p-AlGaN:Mg layers exhibited slower-than-expected transients under ultraviolet illumination and delayed restoration to the initial dark value. The slow transients and delayed restorations can be attributed to a defective surface region which interferes with normal thermionic processes. The top 45 nm of the p-AlGaN:Mg layer was etched using a reactive-ion etch which caused the SPV behavior to be substantially different. From this study, it can be concluded that a defective, near-surface region is inhibiting the change in positive surface charge by allowing tunneling or hopping conductivity of holes from the bulk to the surface, or by the trapping of electrons traveling to the surface by a high concentration of defects in the near-surface region. Etching removes the defective layer and reveals a region of presumably higher quality, as evidenced by substantial changes in the SPV behavior.

  16. Oxidation kinetics of polycrystalline silicon

    SciTech Connect

    Demirlioglu, E.K.

    1989-01-01

    Polysilicon continues to find applications in integrated circuits, both as a substrate for devices and as an actual device component. Polysilicon oxides are particularly important in the fabrication of memory devices such as EPROMs and EEPROMs. In studies of polysilicon oxidation kinetics, it has been observed that undoped and p-type polysilicon both oxidize in a manner similar to <110>-oriented single-crystal silicon. The data in the literature on n-type polysilicon oxidation, however, are limited, have been obtained under different experimental conditions, and often report contradictory results. The oxidation kinetics of doped polysilicon in dry O{sub 2} are examined at several phosphorus concentrations in the 800 to 1000{degree}C range. The oxidation rate of doped polysilicon is found to be slower than that of similarly doped <111>-oriented single-crystal silicon at dopant concentrations below the solid-solubility limit. The similarities and differences between doped polysilicon and single-crystal silicon oxidation are explained on the basis of a previously proposed parallel-oxidation model.

  17. Inherent formation of porous p-type Si nanowires using palladium-assisted chemical etching

    NASA Astrophysics Data System (ADS)

    Chen, Jun-Ming; Chen, Chia-Yuan; Wong, C. P.; Chen, Chia-Yun

    2017-01-01

    Porous silicon (Si) nanowire arrays were directly fabricated from lightly p-doped Si substrates using a palladium (Pd)-assisted chemical etching at room temperature. The mechanistic studies indicated that anodic dissolution of Si was established by the accumulated positive charges at Pd/Si schottky interfaces in the presence of H2O2 oxidants. In addition to the primary etching direction vertically to the substrate planes, the additional sidewall etching was stimulated by the separated Pd nanoparticles during reaction that constitutes the porous features covering on the nanowires surfaces thoroughly. These combined effects lead to the distinct etching characteristics and remarkable photoluminescent properties of resulted nanostructures.

  18. p-type conduction in beryllium-implanted hexagonal boron nitride films

    NASA Astrophysics Data System (ADS)

    He, B.; Zhang, W. J.; Yao, Z. Q.; Chong, Y. M.; Yang, Y.; Ye, Q.; Pan, X. J.; Zapien, J. A.; Bello, I.; Lee, S. T.; Gerhards, I.; Zutz, H.; Hofsäss, H.

    2009-12-01

    p-type conduction in hexagonal boron nitride (hBN) films was achieved by beryllium implantation and subsequent rapid thermal annealing treatment. The dependence of phase composition and electrical properties of hBN films on the implantation fluence and annealing was studied. A maximum resistivity reduction by six orders of magnitude was demonstrated. Hall measurements revealed a corresponding hole concentration of 3×1019 cm-3 and mobility of 27 cm2/V s. The activation energy of Be ions was estimated to be 0.21 eV. It is suggested that hBN is a promising wide bandgap semiconductor for applications in high-temperature electronic devices and transparent conductive coatings.

  19. Improved performance of P-type DSCs with a compact blocking layer coated by different thicknesses

    NASA Astrophysics Data System (ADS)

    Ho, Phuong; Bao, Le Quoc; Cheruku, Rajesh; Kim, Jae Hong

    2016-09-01

    The introduction of different thicknesses of a compact NiO blocking layer coating with different spin speeds on FTO and followed by a coating of photoactive NiO electrode for p-type dye-sensitized solar cells ( p-DSCs). This study examined the fabrication of a compact NiO blocking layer by decomposing an ethanolic precursor solution of nickel acetate tetrahydrate. The DCBZ dye used as the photosensitizer for the NiO electrode in the p-DSCs device and their performances have been analyzed. The enhancement of photovoltaic performance and resulted from an increase in the power conversion efficiency ( η). The electrochemical impedance spectroscopy (EIS) measurement demonstrated that charge recombination was suppressed when a compact NiO blocking layer was applied. The results showed that the best p-DSC was achieved by employing 3000 rpm spin-coated process for different times of blocking layer.

  20. Formation and annealing of radiation defects in tin-doped p-type germanium crystals

    SciTech Connect

    Litvinov, V. V. Petukh, A. N.; Pokotilo, Ju. M.; Markevich, V. P.; Lastovskii, S. B.

    2012-05-15

    The effect of tin on the formation and annealing of radiation defects in p-type germanium crystals irradiated with 6-MeV electrons at a temperature of 80 K is studied. It is shown that acceptor complexes SnV with a hole ionization enthalpy of 0.16 eV are dominant in irradiated Ge:(Sn, Ga) crystals after their heating to a temperature of 300 K. These complexes disappeared as a result of the annealing of irradiated crystals in the temperature range 30-75 Degree-Sign C. Annealing of irradiated crystals at temperatures in the range 110-150 Degree-Sign C brings about the formation of deep-level centers with a donor level at E{sub v} + 0.29 eV; this center is presumably related to a complex consisting of a tin atom and an interstitial gallium atom.

  1. Chemical synthesis of p-type nanocrystalline copper selenide thin films for heterojunction solar cells

    NASA Astrophysics Data System (ADS)

    Ambade, Swapnil B.; Mane, R. S.; Kale, S. S.; Sonawane, S. H.; Shaikh, Arif V.; Han, Sung-Hwan

    2006-12-01

    Nanocrystalline thin films of copper selenide have been grown on glass and tin doped-indium oxide substrates using chemical method. At ambient temperature, golden films have been synthesized and annealed at 200 °C for 1 h and were examined for their structural, surface morphological and optical properties by means of X-ray diffraction (XRD), scanning electron microscopy and UV-vis spectrophotometry techniques, respectively. Cu 2- xSe phase was confirmed by XRD pattern and spherical grains of 30 ± 4 - 40 ± 4 nm in size aggregated over about 130 ± 10 nm islands were seen by SEM images. Effect of annealing on crystallinity improvement, band edge shift and photoelectrochemical performance (under 80 mW/cm 2 light intensity and in lithium iodide electrolyte) has been studied and reported. Observed p-type electrical conductivity in copper selenide thin films make it a suitable candidate for heterojunction solar cells.

  2. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors

    NASA Astrophysics Data System (ADS)

    Kim, Bongjun; Geier, Michael L.; Hersam, Mark C.; Dodabalapur, Ananth

    2017-02-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design.

  3. Rat submaxillary gland contains predominantly P-type tachykinin binding sites

    SciTech Connect

    Buck, S.H.; Burcher, E.

    1985-11-01

    The specific binding of the /sup 125/I-Bolton-Hunter labeled tachykinins substance K (BHSK), eledoisin (BHE), and substance P (BHSP) was examined in crude membrane suspensions and by autoradiography in rat submaxillary gland. All three ligands at 0.1 nM concentrations exhibited binding that was inhibited by tachykinins in a potency rank order of substance P greater than physalaemin greater than substance K greater than eledoisin greater than kassinin greater than neuromedin K with slope factors essentially equal to unity. All tachykinins were 5 to 10 times more potent in inhibiting BHSK and BHE binding compared to BHSP binding. Autoradiographic visualization of BHSK and BHSP binding sites in the gland revealed extensive labeling of mucous and serous acini. The intensity of labeling was much less for BHSK than for BHSP. The results indicate that the rat submaxillary gland contains predominantly P-type tachykinin binding sites.

  4. Electrical detection of spin accumulation and relaxation in p -type germanium

    NASA Astrophysics Data System (ADS)

    Kawano, M.; Ikawa, M.; Santo, K.; Sakai, S.; Sato, H.; Yamada, S.; Hamaya, K.

    2017-08-01

    We report on electrical measurements of spin-dependent transport of holes in all-epitaxial CoFe/p -type germanium (p -Ge)/Fe 3Si spin valves, where the hole concentration (ph) of the p -Ge layer is estimated to be ˜1018cm-3 . Spin-accumulation output voltages can electrically be detected in the antiparallel magnetization state between CoFe and Fe3Si ferromagnetic electrodes. The room-temperature spin lifetime of holes in the p -Ge layers can tentatively be discussed in terms of the theory by Fert and Jaffrès. We propose that the use of (111)-oriented p -Ge with a hole concentration of ˜1018cm-3 enables the transport of spin-polarized holes in bulk Ge even at room temperature.

  5. Phonon bottleneck in p-type Ge/Si quantum dots

    SciTech Connect

    Yakimov, A. I.; Kirienko, V. V.; Armbrister, V. A.; Bloshkin, A. A.; Dvurechenskii, A. V.

    2015-11-23

    We study the effect of quantum dot size on the mid-infrared photo- and dark current, photoconductive gain, and hole capture probability in ten-period p-type Ge/Si quantum dot heterostructures. The dot dimensions are varied by changing the Ge coverage and the growth temperature during molecular beam epitaxy of Ge/Si(001) system in the Stranski-Krastanov growth mode. In all samples, we observed the general tendency: with decreasing the size of the dots, the dark current and hole capture probability are reduced, while the photoconductive gain and photoresponse are enhanced. Suppression of the hole capture probability in small-sized quantum dots is attributed to a quenched electron-phonon scattering due to phonon bottleneck.

  6. A nitride based polarization-engineered photocathode for water splitting without a p-type semiconductor.

    PubMed

    Nakamura, Akihiro; Fujii, Katsushi; Sugiyama, Masakazu; Nakano, Yoshiaki

    2014-08-07

    Photoelectrochemical water splitting is a promising way for hydrogen production with low environmental burden. Although III-nitride semiconductors have potentially favorable properties as water splitting photoelectrodes, they have several limitations for practical use currently. In this study, the concept of a polarization-engineered nitride photocathode for water splitting is proposed to overcome this problem. We observed that the proposed GaN/AlN/GaN structure worked as a photocathode even though it consisted of only n-type III-nitride semiconductors. This polarization-engineered photocathode showed a remarkably stable and relatively high photocurrent since it can avoid the causes of problems from which both n-type and p-type conventional GaN photoelectrodes suffer.

  7. Electronic characteristics of p-type transparent SnO monolayer with high carrier mobility

    NASA Astrophysics Data System (ADS)

    Du, Juan; Xia, Congxin; Liu, Yaming; Li, Xueping; Peng, Yuting; Wei, Shuyi

    2017-04-01

    More recently, two-dimensional (2D) SnO nanosheets are attaching great attention due to its excellent carrier mobility and transparent characteristics. Here, the stability, electronic structures and carrier mobility of SnO monolayer are investigated by using first-principles calculations. The calculations of the phonon dispersion spectra indicate that SnO monolayer is dynamically stable. Moreover, the band gap values are decreased from 3.93 eV to 2.75 eV when the tensile strain is applied from 0% to 12%. Interestingly, SnO monolayer is a p-type transparent semiconducting oxide with hole mobility of 641 cm2 V-1 s-1, which is much higher than that of MoS2 monolayer. These findings make SnO monolayer becomes a promising 2D material for applications in nanoelectronic devices.

  8. Origin of resistivity anomaly in p-type leads chalcogenide multiphase compounds

    SciTech Connect

    Aminorroaya Yamini, Sima E-mail: jsnyder@caltech.edu; Dou, Shi Xue; Mitchell, David R. G.; Wang, Heng; Gibbs, Zachary M.; Pei, Yanzhong; Snyder, G. Jeffrey E-mail: jsnyder@caltech.edu

    2015-05-15

    The electrical resistivity curves for binary phase compounds of p-type lead chalcogenide (PbTe){sub (0.9−x)}(PbSe){sub 0.1}(PbS){sub x,} (x = 0.15, 0.2, 0.25), which contain PbS-rich secondary phases, show different behaviour on heating and cooling between 500-700 K. This is contrast to single phase compounds which exhibit similar behaviour on heating and cooling. We correlate these anomalies in the electrical resistivities of multiphase compounds to the variation in phase composition at high temperatures. The inhomogeneous distribution of dopants between the matrix and secondary phase is found to be crucial in the electronic transport properties of the multiphase compounds. These results can lead to further advances in designing composite Pb-chalcogenides with high thermoelectric performance.

  9. Generation kinetics of boron-oxygen complexes in p-type compensated c-Si

    SciTech Connect

    Wu, Yichao; Yu, Xuegong Chen, Peng; Chen, Xianzi; Yang, Deren

    2014-03-10

    Kinetics characteristics of boron-oxygen complexes responsible for light-induced degradation in p-type compensated c-Si have been investigated. The generation of B-O complexes is well fitted by a fast-forming process and a slow-forming one. Activation energies of complexes generation during the fast-forming process are determined to be 0.29 and 0.24 eV in compensated and non-compensated c-Si, respectively, and those during the slow-forming process are the same, about 0.44 eV. Moreover, it is found that the pre-exponential factors of complexes generation in compensated c-Si is proportional to the square of the net doping concentration, which suggests that the latent centers should exist.

  10. Carrier concentration dependence of acceptor activation energy in p-type ZnO

    NASA Astrophysics Data System (ADS)

    Lopatiuk-Tirpak, O.; Schoenfeld, W. V.; Chernyak, L.; Xiu, F. X.; Liu, J. L.; Jang, S.; Ren, F.; Pearton, S. J.; Osinsky, A.; Chow, P.

    2006-05-01

    The characteristics of an acceptor level in Sb-doped, p-type ZnO were studied using cathodoluminescence (CL) spectroscopy as a function of hole concentration. Variable-temperature CL measurements allowed us to estimate the activation energy of an Sb-related acceptor from temperature-induced decay of CL intensity. The values of activation energy of about 212±28, 175±20, 158±22, and 135±15meV were obtained for samples with carrier concentrations of 1.3×1017, 6.0×1017, 8.2×1017, and 1.3×1018cm-3, respectively. The involvement of acceptor levels is supported by the temperature-dependent hole concentration measurements. The possible origins of the strong temperature dependence are discussed.

  11. Studies of minority carrier diffusion length increase in p-type ZnO:Sb

    NASA Astrophysics Data System (ADS)

    Lopatiuk-Tirpak, O.; Chernyak, L.; Xiu, F. X.; Liu, J. L.; Jang, S.; Ren, F.; Pearton, S. J.; Gartsman, K.; Feldman, Y.; Osinsky, A.; Chow, P.

    2006-10-01

    Minority electron diffusion length was measured in p-type, Sb-doped ZnO as a function of temperature using the electron beam induced current technique. A thermally induced increase of electron diffusion length was determined to have an activation energy of 184±10meV. Irradiation with a low energy (5kV) electron beam also resulted in an increase of diffusion length with a similar activation energy (219±8meV). Both phenomena are suggested to involve a SbZn-2VZn acceptor complex. Saturation and relaxation dynamics of minority carrier diffusion length are explored. Details of a possible mechanism for diffusion length increase are presented.

  12. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors.

    PubMed

    Kim, Bongjun; Geier, Michael L; Hersam, Mark C; Dodabalapur, Ananth

    2017-02-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design.

  13. Enhancement of p-type conductivity in nanocrystalline BaTiO3 ceramics

    NASA Astrophysics Data System (ADS)

    Guo, Xin; Pithan, Christian; Ohly, Christian; Jia, Chun-Lin; Dornseiffer, Jügen; Haegel, Franz-Hubert; Waser, Rainer

    2005-02-01

    Undoped BaTiO3 ceramic samples with an average grain size of ˜35nm were prepared and the electrical properties investigated. The defect structure is dominated by acceptor impurities; therefore, the conductivity of nanocrystalline BaTiO3 is of p-type. Comparing with microcrystalline BaTiO3, the conductivity of nanocrystalline BaTiO3 is about 1 to 2 orders of magnitude higher and the activation energy remarkably lower, which is ascribed to a greatly reduced oxidation enthalpy in nanocrystalline BaTiO3 (˜0.3 versus ˜0.92eV for microcrystalline BaTiO3).

  14. Conduction type control from n to p type for organic pigment films purified by reactive sublimation

    NASA Astrophysics Data System (ADS)

    Hiramoto, Masahiro; Ihara, Kiyoaki; Fukusumi, Hiroyuki; Yokoyama, Masaaki

    1995-12-01

    The effects of purification by reactive sublimation technique and bromine doping on the Fermi level and the photovoltaic properties of n-type perylene pigment films were investigated. Photovoltage arisen from the Schottky junction between n-type perylene pigment film and Au increased significantly by repeating the train sublimation under methylamine gas atmosphere. This phenomenon was revealed to be due to the negative shift of the Fermi level resulting from the effective removal of unknown but specific impurity acting as an acceptor by reactive sublimation. On the other hand, by bromine doping, Fermi level of the pigment film shifted largely to a positive direction and reached the nearby valence band, while the direction of photocurrent flow arising from the Schottky junction with Au was reversed. This result is a clear demonstration of alternating the type of conduction from n type to p type. This means that the pn control of organic semiconductors is possible.

  15. Studies of minority carrier diffusion length increase in p-type ZnO:Sb

    SciTech Connect

    Lopatiuk-Tirpak, O.; Chernyak, L.; Xiu, F. X.; Liu, J. L.; Jang, S.; Ren, F.; Pearton, S. J.; Gartsman, K.; Feldman, Y.; Osinsky, A.; Chow, P.

    2006-10-15

    Minority electron diffusion length was measured in p-type, Sb-doped ZnO as a function of temperature using the electron beam induced current technique. A thermally induced increase of electron diffusion length was determined to have an activation energy of 184{+-}10 meV. Irradiation with a low energy (5 kV) electron beam also resulted in an increase of diffusion length with a similar activation energy (219{+-}8 meV). Both phenomena are suggested to involve a Sb{sub Zn}-2V{sub Zn} acceptor complex. Saturation and relaxation dynamics of minority carrier diffusion length are explored. Details of a possible mechanism for diffusion length increase are presented.

  16. Arsenic doped p-type zinc oxide films grown by radio frequency magnetron sputtering

    SciTech Connect

    Fan, J. C.; Zhu, C. Y.; Fung, S.; To, C. K.; Yang, B.; Beling, C. D.; Ling, C. C.; Zhong, Y. C.; Wong, K. S.; Xie, Z.; Brauer, G.; Skorupa, W.; Anwand, W.

    2009-10-01

    As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate temperature during growth was raised above approx400 deg. C, the films changed from n type to p type. Hole concentration and mobility of approx6x10{sup 17} cm{sup -3} and approx6 cm{sup 2} V{sup -1} s{sup -1} were achieved. The ZnO films were studied by secondary ion mass spectroscopy, x-ray photoelectron spectroscopy (XPS), low temperature photoluminescence (PL), and positron annihilation spectroscopy (PAS). The results were consistent with the As{sub Zn}-2V{sub Zn} shallow acceptor model proposed by Limpijumnong et al. [Phys. Rev. Lett. 92, 155504 (2004)]. The results of the XPS, PL, PAS, and thermal studies lead us to suggest a comprehensive picture of the As-related shallow acceptor formation.

  17. Characterization of a P-type ATPase of the archaebacterium Methanococcus voltae.

    PubMed

    Dharmavaram, R M; Konisky, J

    1989-08-25

    The vanadate-sensitive ATPase of Methanococcus voltae has been purified by a procedure which includes, purification of the cytoplasmic membrane by sucrose gradient centrifugation, solubilization with Triton X-100, and DEAE-Sephadex and Sephacryl S-300 chromatography. While the DEAE-Sephadex step provided a preparation consisting of two polypeptides (74 and 52 kDa), the Sephacryl S-300 step yields a product with a subunit of 74 kDa. Incubation of either membranes or purified ATPase with [gamma-32P]ATP followed by acidic (pH 2.4) lithium dodecyl sulfate-polyacrylamide gel electrophoresis demonstrated the vanadate-sensitive labeling of a 74-kDa acyl phosphate intermediate. These results indicate that the M. voltae ATPase is of the P-type.

  18. Electron Traps Detected in p-type GaAsN Using Deep Level Transient Spectroscopy

    SciTech Connect

    Johnston, S.; Kurtz, S.; Friedman, D.; Ptak, A.; Ahrenkiel, R.; Crandall, R.

    2005-01-01

    The GaAsN alloy can have a band gap as small as 1.0 eV when the nitrogen composition is about 2%. Indium can also be added to the alloy to increase lattice matching to GaAs and Ge. These properties are advantageous for developing a highly-efficient, multi-junction solar cell. However, poor GaAsN cell properties, such as low open-circuit voltage, have led to inadequate performance. Deep-level transient spectroscopy of p-type GaAsN has identified an electron trap having an activation energy near 0.2 eV and a trap density of at least 1016 cm-3. This trap level appears with the addition of small amounts of nitrogen to GaAs, which also corresponds to an increased drop in open-circuit voltage.

  19. Chemical Composition of Nanoporous Layer Formed by Electrochemical Etching of p-Type GaAs.

    PubMed

    Bioud, Youcef A; Boucherif, Abderraouf; Belarouci, Ali; Paradis, Etienne; Drouin, Dominique; Arès, Richard

    2016-12-01

    We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence (CL), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). It was found that after electrochemical etching, the porous layer showed a major decrease in the CL intensity and a change in chemical composition and in the crystalline phase. Contrary to previous reports on p-GaAs porosification, which stated that the formed layer is composed of porous GaAs, we report evidence that the porous layer is in fact mainly constituted of porous As2O3. Finally, a qualitative model is proposed to explain the porous As2O3 layer formation on p-GaAs substrate.

  20. Polymer photovoltaic cell embedded with p-type single walled carbon nanotubes fabricated by spray process.

    PubMed

    Kim, Dal-Ho; Park, Jea-Gun

    2012-08-17

    In the current study, we fabricated polymer (poly(3-hexylthiophene-2,5-diyl) (P3HT) and [6,6]-phenyl-C(61) butyric-acid methyl-ester (PCBM) blend) photovoltaic (PV) cells embedded with p-type single walled carbon nanotubes (SWCNTs) with tangled hair morphology. The power conversion efficiency (PCE) rapidly increased with SWCNT concentration of up to 6.83% coverage, and then decreased and saturated with increasing SWCNT concentration; i.e., the PCE peaks at 5.379%. This tendency is mainly associated with hole transport efficiency toward the transparent electrode (indium-tin-oxide (ITO)) via SWCNTs, directly determining the series resistance and shunt resistance of the polymer PV cells embedded with SWCNTs: the PV cell is increasing shunt resistance and decreasing series resistance.

  1. Photostable p-type dye-sensitized photoelectrochemical cells for water reduction.

    PubMed

    Ji, Zhiqiang; He, Mingfu; Huang, Zhongjie; Ozkan, Umit; Wu, Yiying

    2013-08-14

    A photostable p-type NiO photocathode based on a bifunctional cyclometalated ruthenium sensitizer and a cobaloxime catalyst has been created for visible-light-driven water reduction to produce H2. The sensitizer is anchored firmly on the surface of NiO, and the binding is resistant to the hydrolytic cleavage. The bifunctional sensitizer can also immobilize the water reduction catalyst. The resultant photoelectrode exhibits superior stability in aqueous solutions. Stable photocurrents have been observed over a period of hours. This finding is useful for addressing the degradation issue in dye-sensitized photoelectrochemical cells caused by desorption of dyes and catalysts. The high stability of our photocathodes should be important for the practical application of these devices for solar fuel production.

  2. Highly conductive p-type amorphous oxides from low-temperature solution processing

    SciTech Connect

    Li Jinwang; Tokumitsu, Eisuke; Koyano, Mikio; Mitani, Tadaoki; Shimoda, Tatsuya

    2012-09-24

    We report solution-processed, highly conductive (resistivity 1.3-3.8 m{Omega} cm), p-type amorphous A-B-O (A = Bi, Pb; B = Ru, Ir), processable at temperatures (down to 240 Degree-Sign C) that are compatible with plastic substrates. The film surfaces are smooth on the atomic scale. Bi-Ru-O was analyzed in detail. A small optical bandgap (0.2 eV) with a valence band maximum (VBM) below but very close to the Fermi level (binding energy E{sub VBM} = 0.04 eV) explains the high conductivity and suggests that they are degenerated semiconductors. The conductivity changes from three-dimensional to two-dimensional with decreasing temperature across 25 K.

  3. p-Type zinc oxide films grown by infrared-light-assisted pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Hiraide, Toshihiro; Kurumi, Satoshi; Suzuki, Kaoru

    2013-03-01

    In this paper, ZnO films were grown on sapphire (0001) substrates by infrared-light-assisted pulsed-laser deposition (IRA-PLD). In addition, a nitrogen-plasma-assisted (PA-N) system was utilized for effectively doping the acceptor by radio frequency induction coupled plasma (RF-ICP). The effect of IRA-PLD and PA-N systems was investigated by studying the difference in substrate temperature with and without plasma assistance. We found that ZnO films exhibit no exciton emission with PA-N at a high temperature and that an increase in the substrate temperature yields ZnO films with a (002) and c-axis preferred orientation in a nitrogen (N2) gas atmosphere. ZnO films are changed from n-type to p-type at a substrate temperature of 673 K by IRA-PLD with an N2 background atmosphere.

  4. Versatile p-Type Chemical Doping to Achieve Ideal Flexible Graphene Electrodes.

    PubMed

    Han, Tae-Hee; Kwon, Sung-Joo; Li, Nannan; Seo, Hong-Kyu; Xu, Wentao; Kim, Kwang S; Lee, Tae-Woo

    2016-05-17

    We report effective solution-processed chemical p-type doping of graphene using trifluoromethanesulfonic acid (CF3 SO3 H, TFMS), that can provide essential requirements to approach an ideal flexible graphene anode for practical applications: i) high optical transmittance, ii) low sheet resistance (70 % decrease), iii) high work function (0.83 eV increase), iv) smooth surface, and iv) air-stability at the same time. The TFMS-doped graphene formed nearly ohmic contact with a conventional organic hole transporting layer, and a green phosphorescent organic light-emitting diode with the TFMS-doped graphene anode showed lower operating voltage, and higher device efficiencies (104.1 cd A(-1) , 80.7 lm W(-1) ) than those with conventional ITO (84.8 cd A(-1) , 73.8 lm W(-1) ). © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Arsenic doped p-type zinc oxide films grown by radio frequency magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Fan, J. C.; Zhu, C. Y.; Fung, S.; Zhong, Y. C.; Wong, K. S.; Xie, Z.; Brauer, G.; Anwand, W.; Skorupa, W.; To, C. K.; Yang, B.; Beling, C. D.; Ling, C. C.

    2009-10-01

    As-doped ZnO films were grown by the radio frequency magnetron sputtering method. As the substrate temperature during growth was raised above ˜400 °C, the films changed from n type to p type. Hole concentration and mobility of ˜6×1017 cm-3 and ˜6 cm2 V-1 s-1 were achieved. The ZnO films were studied by secondary ion mass spectroscopy, x-ray photoelectron spectroscopy (XPS), low temperature photoluminescence (PL), and positron annihilation spectroscopy (PAS). The results were consistent with the AsZn-2VZn shallow acceptor model proposed by Limpijumnong et al. [Phys. Rev. Lett. 92, 155504 (2004)]. The results of the XPS, PL, PAS, and thermal studies lead us to suggest a comprehensive picture of the As-related shallow acceptor formation.

  6. P-type calcium channels are blocked by the alkaloid daurisoline.

    PubMed

    Lu, Y M; Fröstl, W; Dreessen, J; Knöpfel, T

    1994-07-21

    IN looking for a structurally defined non-peptide P-channel blocker we have tested the alkaloid daurisoline which has been isolated from traditional Chinese medicinal herb (Menispermum dauricum) used for the treatment of epilepsy, hypertension and asthma. We have found that daurisoline is an inhibitor of omega-Aga-IVA sensitive barium currents in cerebellar Purkinje cells and of excitatory postsynaptic potentials evoked in Purkinje cells by stimulating parallel fibres in acutely prepared cerebellar slices. Daurisoline did not significantly affect omega-Aga-IVA-insensitive barium currents recorded from granule cells freshly isolated from rat cerebellum. Daurisoline passes the blood-brain barrier and will, therefore, facilitate the functional characterization of brain calcium channels as well as the exploration of P-type calcium channels as possible drug targets.

  7. Chemical Composition of Nanoporous Layer Formed by Electrochemical Etching of p-Type GaAs

    NASA Astrophysics Data System (ADS)

    Bioud, Youcef A.; Boucherif, Abderraouf; Belarouci, Ali; Paradis, Etienne; Drouin, Dominique; Arès, Richard

    2016-10-01

    We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence (CL), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). It was found that after electrochemical etching, the porous layer showed a major decrease in the CL intensity and a change in chemical composition and in the crystalline phase. Contrary to previous reports on p-GaAs porosification, which stated that the formed layer is composed of porous GaAs, we report evidence that the porous layer is in fact mainly constituted of porous As2O3. Finally, a qualitative model is proposed to explain the porous As2O3 layer formation on p-GaAs substrate.

  8. Inkjet printed circuits based on ambipolar and p-type carbon nanotube thin-film transistors

    PubMed Central

    Kim, Bongjun; Geier, Michael L.; Hersam, Mark C.; Dodabalapur, Ananth

    2017-01-01

    Ambipolar and p-type single-walled carbon nanotube (SWCNT) thin-film transistors (TFTs) are reliably integrated into various complementary-like circuits on the same substrate by inkjet printing. We describe the fabrication and characteristics of inverters, ring oscillators, and NAND gates based on complementary-like circuits fabricated with such TFTs as building blocks. We also show that complementary-like circuits have potential use as chemical sensors in ambient conditions since changes to the TFT characteristics of the p-channel TFTs in the circuit alter the overall operating characteristics of the circuit. The use of circuits rather than individual devices as sensors integrates sensing and signal processing functions, thereby simplifying overall system design. PMID:28145438

  9. Electrospun p-Type Nickel Oxide Semiconducting Nanowires for Low-Voltage Field-Effect Transistors.

    PubMed

    Liu, Ao; Meng, You; Zhu, Huihui; Noh, Yong-Young; Liu, Guoxia; Shan, Fukai

    2017-10-02

    One-dimensional metal-oxide nanowires are regarded as important building blocks in nanoscale electronics, because of their unique mechanical and electrical properties. In this work, p-type nickel oxide nanowires (NiO NWs) were fabricated by combining sol-gel and electrospinning processes. The poly(vinylpyrrolidone) (PVP) with a molecular weight of 1 300 000 was used as the polymer matrix to increase the viscosity of a NiO precursor solution. The formation and properties of the as-spun NiO/PVP composite NWs before/after calcination treatment were investigated using various techniques. Because of the enhanced adhesion properties between ultraviolet (UV)-treated NiO NWs and the substrate, the field-effect transistors (FETs) based on NiO NWs were found to exhibit satisfying p-channel behaviors. For the fabrication of aligned NiO NW arrays, two parallel conducting Si strips were grounded as NW collector. The integrated FETs based on aligned NiO NWs were demonstrated to exhibit superior electrical performance, compared to the disordered counterparts with the comparable NW coverage. By employing high-k aluminum oxide (Al2O3) as a dielectric layer, instead of conventional SiO2, the devices with an aligned NiO NW array exhibit a high hole mobility of 2.8 cm(2)/(V s) with a low operating voltage of 5 V, fast switching speed, and successful modulation of light emission over external light-emitting diodes. To the best of our knowledge, this is the first work demonstrating the low-voltage transistors based on p-type oxide NWs, which represents a great step toward the development of sensors and CMOS logic circuits.

  10. In vitro effect of valepotriates isolated from Valeriana glechomifolia on rat P-type ATPases.

    PubMed

    Bettero, Gustavo M; Salles, Luisa; Rosário Figueira, Renata M; Poser, Gilsane von; Rates, Stela M K; Noël, François; Quintas, Luis Eduardo M; Quintas, Luis E M

    2011-10-01

    Valepotriates are iridoids found in variable amounts in Valerianaceae and might be among the bioactive compounds which confer anxiolytic properties to the Valeriana species. On the other hand, unspecific cytotoxicity has also been described. Presently, however, no particular molecular target has been defined for these compounds. Here we studied the effect of valtrate, acevaltrate, and 1- β-acevaltrate isolated from Valeriana glechomifolia on the enzymatic activity of rat P-type ATPases. Valepotriates did not affect rat skeletal muscle sarco/endoplasmic reticulum Ca²⁺-ATPase (SERCA) activity at the highest concentration used (100 µM). In contrast, the same concentration inhibited roughly half of the total H⁺/K⁺-ATPase activity from rat gastric epithelium (valtrate 54.6 ± 3.2 %, acevaltrate 60.7 ± 7.3 %, 1- β-acevaltrate 50.2 ± 3.1 %; mean ± SEM, n = 3-5). Finally, these substances showed the highest inhibitory potency toward Na⁺/K⁺-ATPase, and the inhibition curves obtained provided a similar IC₅₀ (in µM) for rat kidney α1 isoform (valtrate 21.2, acevaltrate 22.8, 1- β-acevaltrate 24.4) and brain hemispheres α2/ α3 isoforms (valtrate 19.4, acevaltrate 42.3, 1- β-acevaltrate 38.3). Our results suggest that P-type ATPases are differentially inhibited by valepotriates and that Na⁺/K⁺-ATPase might be one of their molecular targets in vivo. © Georg Thieme Verlag KG Stuttgart · New York.

  11. Theoretical considerations for Reaction-Formed Silicon Carbide (RFSC) formation by molten silicon infiltration into slurry-derived preforms

    NASA Technical Reports Server (NTRS)

    Behrendt, D. R.; Singh, M.

    1993-01-01

    For reaction-formed silicon carbide (RFSC) ceramics produced by silicon melt infiltration of porous carbon preforms, equations are developed to relate the amount of residual silicon to the initial carbon density. Also, for a slurry derived preform containing both carbon and silicon powder, equations are derived which relate the amount of residual silicon in the RFSC to the relative density of the carbon in the preform and to the amount of silicon powder added to the slurry. For a porous carbon preform that does not have enough porosity to prevent choking-off of the silicon infiltration, these results show that complete silicon infiltration can occur by adding silicon powder to the slurry mixture used to produce these preforms.

  12. The Establishment of a Production-ready Manufacturing Process Utilizing Thin Silicon Substrates for Solar Cells

    NASA Technical Reports Server (NTRS)

    Pryor, R. A.

    1979-01-01

    During the months of February and March, work towards the goals of the contract were started as scheduled. The first shipment of thin substrates were received and wafer processing was initiated. The objective of the contract is to investigate, develop and characterize the methods for establishing a production-ready manufacturing process which utilizes thin silicon substrates for solar cells. The thin substrates to be manufactured are three inches diameter, p-type Czochralski wafers of approximately 1 Omega cm resistivity. The wafers are prepared by sawing directly to thickness of 8 mils and 5 mils. To ensure removal of residual saw damage, most substrates are chemically etched to final thicknesses of 7 mils and 4 mils. The thin substrates are used to fabricate solar cells by standard processing techniques.

  13. Light-emitting diodes based on n-ZnO nano-wires and p-type organic semiconductors

    NASA Astrophysics Data System (ADS)

    Willander, M.; Wadeasa, A.; Klason, P.; Yang, Lili; Lubana Beegum, S.; Raja, S.; Zhao, Q. X.; Nur, O.

    2008-02-01

    After our recent successful demonstration of high brightness white light emitting diodes (HB-LEDs) based on high temperature grown n-ZnO nanowires on different p-type semiconductors, we present here LEDs fabricated on n-ZnO nano-wires and p-type organic semiconductors. By employing a low temperature chemical growth (<= 90 °C) approach for ZnO synthesis combined together with organic p-type semiconductors, we demonstrate high quality LEDs fabricated on a variety of different substrates. The substrates include transparent glass, plastic, and conventional Si. Different multi-layers of p-type organic semiconductors with or without electron blocking layers have been demonstrated and characterized. The investigated p-type organic semiconductors include PEDOT:PSS, which was used as a anode in combination with other p-type polymers. Some of the heterojunction diodes also contain an electron blocking polymer sandwiched between the p-type polymer and the n-ZnO nano-wire. The insertion of electron blocking layer is necessary to engineer the device for the desired emission. Structural and electrical results will be presented. The preliminary I-V characteristics of the organic-inorganic hybrid heterojunction diodes show good rectifying properties. Finally we also present our findings on the origin of the green luminescence band which is responsible of the white light emission in ZnO is discussed.

  14. Fitting Formulas For Determining The Existence Of S-Type And P-Type Habitable Zones In Binary Systems: First Results

    NASA Astrophysics Data System (ADS)

    Wang, Zhaopeng; Cuntz, Manfred

    2016-09-01

    We present initial work about attaining fitting formulas for the quick determination of the existence of S-type and P-type habitable zones in binary systems. Following previous work, we calculate the limits of the climatological habitable zone in binary systems (which sensitively depend on the system parameters) based on a joint constraint encompassing planetary orbital stability and a habitable region for a possible system planet. We also consider updated results on planetary climate models previously obtained by Kopparapu and collaborators. Fitting equations based on our work are presented for selected cases.

  15. N-Type delta Doping of High-Purity Silicon Imaging Arrays

    NASA Technical Reports Server (NTRS)

    Blacksberg, Jordana; Hoenk, Michael; Nikzad, Shouleh

    2005-01-01

    A process for n-type (electron-donor) delta doping has shown promise as a means of modifying back-illuminated image detectors made from n-doped high-purity silicon to enable them to detect high-energy photons (ultraviolet and x-rays) and low-energy charged particles (electrons and ions). This process is applicable to imaging detectors of several types, including charge-coupled devices, hybrid devices, and complementary metal oxide/semiconductor detector arrays. Delta doping is so named because its density-vs.-depth characteristic is reminiscent of the Dirac delta function (impulse function): the dopant is highly concentrated in a very thin layer. Preferably, the dopant is concentrated in one or at most two atomic layers in a crystal plane and, therefore, delta doping is also known as atomic-plane doping. The use of doping to enable detection of high-energy photons and low-energy particles was reported in several prior NASA Tech Briefs articles. As described in more detail in those articles, the main benefit afforded by delta doping of a back-illuminated silicon detector is to eliminate a "dead" layer at the back surface of the silicon wherein high-energy photons and low-energy particles are absorbed without detection. An additional benefit is that the delta-doped layer can serve as a back-side electrical contact. Delta doping of p-type silicon detectors is well established. The development of the present process addresses concerns specific to the delta doping of high-purity silicon detectors, which are typically n-type. The present process involves relatively low temperatures, is fully compatible with other processes used to fabricate the detectors, and does not entail interruption of those processes. Indeed, this process can be the last stage in the fabrication of an imaging detector that has, in all other respects, already been fully processed, including metallized. This process includes molecular-beam epitaxy (MBE) for deposition of three layers, including

  16. Characterization of an Innovative p-type Epitaxial Diode for Dosimetry in Modern External Beam Radiotherapy

    NASA Astrophysics Data System (ADS)

    Aldosari, A. H.; Espinoza, A.; Robinson, D.; Fuduli, I.; Porumb, C.; Alshaikh, S.; Carolan, M.; Lerch, M. L. F.; Perevertaylo, V.; Rosenfeld, A. B.; Petasecca, M.

    2013-12-01

    Due to the ever-increasing complexity of treatment modalities in radiation therapy, there has been a greater need for detectors to perform quality assurance to ensure patients are treated correctly and safely. Modern radiation therapy techniques involve small field sizes, high dose gradients, and varying intensity of energy and rate. The ideal dosimeter for this treatment should display high spatial resolution, high linearity, accuracy, and radiation hardness. Silicon detectors have been widely used for radiotherapy measurements and have many attractive qualities as a dosimeter; weaknesses of silicon detectors are, however, decreases in sensitivity with accumulated dose. The Centre for Medical Radiation Physics has developed a new technology with an unusual charge collection efficiency variation with accumulated dose which stabilizes the response of the detector within ±5% after 120 kGy photon irradiation. The sensor has been also characterized by irradiation by an 18 MV medical LINAC with sensitivity to a photoneutron-induced damage of less than 0.5%/100 Gy. The radiation damage mechanism has been validated by TCAD simulations which confirmed the mechanism behind the CCE increase as a function of the accumulated dose.

  17. Charge carrier transport and lifetimes in n-type and p-type phosphorene as 2D device active materials: an ab initio study.

    PubMed

    Tea, E; Hin, C

    2016-08-10

    In this work, we provide a detailed analysis of phosphorene's performance as an n-type and p-type active material. This study is based on first principles calculations of the phosphorene electronic structure, and the resulting electron and hole scattering rates and lifetimes. Emphasis is put on extreme regimes commonly found in semiconductor devices, i.e. high electric fields and heavy doping, where impact ionization and Auger recombination can occur. We found that electron-initiated impact ionization is weaker than the hole-initiated process, when compared to carrier-phonon interaction rates, suggesting resilience to impact ionization initiated breakdown. Moreover, calculated minority electron lifetimes are limited by radiative recombination only, not by Auger processes, suggesting that phosphorene could achieve good quantum efficiencies in optoelectronic devices. The provided scattering rates and lifetimes are critical input data for the modeling and understanding of phosphorene-based device physics.

  18. First-principles study of Be doped CuAlS2 for p-type transparent conductive materials

    NASA Astrophysics Data System (ADS)

    Huang, Dan; Zhao, Yu-Jun; Tian, Ren-Yu; Chen, Di-Hu; Nie, Jian-Jun; Cai, Xin-Hua; Yao, Chun-Mei

    2011-06-01

    CuAlS2 has attracted much attention recently as a p-type transparent conductive material. In this paper, we investigate the site preference of substitutional Be in CuAlS2 and the transition level of BeAl using the first-principles calculation. We find that Be would be doped effectively at Al sites in CuAlS2 as a good p-type dopant. In addition, we speculate that Be-Mg or Be-Zn codoped CuAlS2 could have a mobility enhancement and thus a good p-type conductivity due to low lattice distortion.

  19. Glucose-assisted reduction achieved transparent p-type cuprous oxide thin film by a solution method

    NASA Astrophysics Data System (ADS)

    Nie, Sha; Sun, Jian; Gong, Hao; Chen, Zequn; Huang, Yifei; Xu, Jianmei; Zhao, Ling; Zhou, Wei; Wang, Qing

    2016-08-01

    The fabrication of p-type cuprous oxide thin film via a cheap and simple chemical method has been known as challenging. We first find that glucose can assist reduce Cu to a lower valence state in the preparation of cuprous oxide films by the sol-gel method. By first adding glucose in the sol as reducing agent, oxidation from the oxygen in the environment is limited and transparent p-type cuprous oxide films are eventually achieved under optimized experimental conditions. We have developed a p-type cuprous oxide thin film with an optimal Hall mobility of ∼8 cm2/Vs and an optical transmittance of 78%.

  20. Silicon carbide photoconductive switches

    NASA Astrophysics Data System (ADS)

    Saddow, Stephen E.

    1994-09-01

    The optoelectronic properties of p-type 6-H silicon carbide (6H-SiC) have been investigated in an experiment that used lateral and vertical photoconductive (PC) switches. Both photovoltaic and photoconductive effects are reported, which were observed on switches using both geometries and measured at several wavelengths near the 6H-SiC absorption edge. PC techniques were employed to measure the surface and bulk carrier lifetimes of 40 and 200 ns, respectively. The switches displayed a high-speed photovoltaic response to picosecond laser excitations in the UV and visible spectral regions. In particular, efficient subnanosecond optical absorption processes were observed in the visible region. The photovoltage was measured as a function of both laser wavelength (and hence absorption depth) and laser beam position within the switching gap. The switch response to picosecond laser pulses in the UV, violet, green, and red spectral regions was shown to have subnanosecond photovoltaic response times. Finally, since the optical absorption coefficient had not been well established for device-grade 6H-SiC, the optical absorption coefficient near the 6H-SiC bandgap energy (Eg) was also measured, and the bandgap was determined to be approximately 3.1 eV.

  1. Rapid Solid-State Metathesis Routes to Nanostructured Silicon-Germainum

    NASA Technical Reports Server (NTRS)

    Kaner, Richard B. (Inventor); Bux, Sabah K. (Inventor); Fleurial, Jean-Pierre (Inventor); Rodriguez, Marc (Inventor)

    2014-01-01

    Methods for producing nanostructured silicon and silicon-germanium via solid state metathesis (SSM). The method of forming nanostructured silicon comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and an alkaline earth metal silicide into a homogeneous powder, and initating the reaction between the silicon tetraiodide (SiI4) with the alkaline earth metal silicide. The method of forming nanostructured silicon-germanium comprises the steps of combining a stoichiometric mixture of silicon tetraiodide (SiI4) and a germanium based precursor into a homogeneous powder, and initiating the reaction between the silicon tetraiodide (SiI4) with the germanium based precursors.

  2. Silicon production process evaluations

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Chemical engineering analysis of the HSC process (Hemlock Semiconductor Corporation) for producing silicon from dichlorosilane in a 1,000 MT/yr plant was continued. Progress and status for the chemical engineering analysis of the HSC process are reported for the primary process design engineering activities: base case conditions (85%), reaction chemistry (85%), process flow diagram (60%), material balance (60%), energy balance (30%), property data (30%), equipment design (20%) and major equipment list (10%). Engineering design of the initial distillation column (D-01, stripper column) in the process was initiated. The function of the distillation column is to remove volatile gases (such as hydrogen and nitrogen) which are dissolved in liquid chlorosilanes. Initial specifications and results for the distillation column design are reported including the variation of tray requirements (equilibrium stages) with reflux ratio for the distillation.

  3. Role of point defects/defect complexes in silicon device processing. Book of abstracts, fourth workshop

    SciTech Connect

    Not Available

    1994-06-01

    The 41 abstracts are arranged into 6 sessions: impurities and defects in commercial substrates: their sources, effects on material yield, and material quality; impurity gettering in silicon: limits and manufacturability of impurity gettering and in silicon solar cells; impurity/defect passivation; new concepts in silicon growth: improved initial quality and thin films; and silicon solar cell design opportunities.

  4. Growth and Characterization of the p-type Semiconductors Tin Sulfide and Bismuth Copper Oxy Selenide

    NASA Astrophysics Data System (ADS)

    Francis, Jason

    BiCuOSe and SnS are layered, moderate band gap (epsilon G ≈ 1 eV) semiconductors that exhibit intrinsic p type conductivity. Doping of BiCuOSe with Ca results in a slight expansion of the lattice and an increase of the hole concentration from 10 18 cm--3 to greater than 1020 cm --3. The large carrier density in undoped films is the result of copper vacancies. Mobility is unaffected by doping, remaining constant at 1.5 cm2V--1s--1 in both undoped and doped films, because the Bi-O layers serve as the source of carriers, while transport occurs within the Cu-Se layers. Bi possesses a 6s2 lone pair that was expected to hybridize with the oxygen p states at the top of the valence band, resulting in high hole mobility as compared to similar materials such as LaCuOSe, which lack this lone pair. However, both LaCuOSe and BiCuOSe have similar hole mobility. X-ray absorption and emission spectroscopy, combined with density functional theory calculations, reveal that the Bi 6 s states contribute deep within the valence band, forming bonding and anti-bonding states with O 2p at 11 eV and 3 eV below the valence band maximum, respectively. Hence, the Bi lone pair does not contribute at the top of the valence band and does not enhance the hole mobility. The Bi 6p states contribute at the bottom of the conduction band, resulting in a smaller band gap for BiCuOSe than LaCuOSe (1 eV vs. 3 eV). SnS is a potential photovoltaic absorber composed of weakly coupled layers stacked along the long axis. This weak coupling results in the formation of strongly oriented films on amorphous substrates. The optical band gap is 1.2 eV, in agreement with GW calculations. Absorption reaches 105 cm--1 within 0.5 eV of the band gap. The p type conduction arises from energetically favorable tin vacancies. Variation of growth conditions yields carrier densities of 1014 -- 1016 cm--3 and hole mobility of 7 -- 15 cm2V--1s--1. SnS was alloyed with rocksalt CaS, which was predicted to form a rocksalt

  5. Mechanisms for p -type behavior of ZnO, Zn1 -xMgxO , and related oxide semiconductors

    NASA Astrophysics Data System (ADS)

    Urban, Daniel F.; Körner, Wolfgang; Elsässer, Christian

    2016-08-01

    The possibilities of turning intrinsically n -type oxide semiconductors like ZnO and Zn1 -xMgxO into p -type materials are investigated. Motivated by recent experiments on Zn1 -xMgxO doped with nitrogen, we analyze the electronic defect levels of point defects NO,vZn, and NO-vZn pairs in ZnO and Zn1 -xMgxO by means of self-interaction-corrected density functional theory calculations. We show how the interplay of defects can lead to shallow acceptor defect levels, although the levels of individual point defects NO are too deep in the band gap to be responsible for p -type conduction. We relate our results to p -type conduction paths at grain boundaries seen in polycrystalline ZnO and develop an understanding of a p -type mechanism which is common to ZnO, Zn1 -xMgxO , and related materials.

  6. Revealing of the transition from n- to p-type conduction of InN:Mg by photoconductivity effect measurement

    NASA Astrophysics Data System (ADS)

    Guo, L.; Wang, X. Q.; Zheng, X. T.; Yang, X. L.; Xu, F. J.; Tang, N.; Lu, L. W.; Ge, W. K.; Shen, B.; Dmowski, L. H.; Suski, T.

    2014-03-01

    We report evidence of the transition from n- to p-type conduction of InN with increasing Mg dopant concentration by using photoconductivity (PC) measurement at room temperature. This transition is depicted as a conversion from negative to positive PC under above-bandgap optical excitation. The n- to p-type transition in InN:Mg is further confirmed by thermopower measurements. PC detection method is a bulk effect since the optical absorption of the surface electron accumulation is negligibly low due to its rather small thickness, and thus shows advantage to detect p-type conduction. This technique is certainly helpful to study p-type doping of InN, which is still a subject of discussions.

  7. Revealing of the transition from n- to p-type conduction of InN:Mg by photoconductivity effect measurement.

    PubMed

    Guo, L; Wang, X Q; Zheng, X T; Yang, X L; Xu, F J; Tang, N; Lu, L W; Ge, W K; Shen, B; Dmowski, L H; Suski, T

    2014-03-13

    We report evidence of the transition from n- to p-type conduction of InN with increasing Mg dopant concentration by using photoconductivity (PC) measurement at room temperature. This transition is depicted as a conversion from negative to positive PC under above-bandgap optical excitation. The n- to p-type transition in InN:Mg is further confirmed by thermopower measurements. PC detection method is a bulk effect since the optical absorption of the surface electron accumulation is negligibly low due to its rather small thickness, and thus shows advantage to detect p-type conduction. This technique is certainly helpful to study p-type doping of InN, which is still a subject of discussions.

  8. Revealing of the transition from n- to p-type conduction of InN:Mg by photoconductivity effect measurement

    PubMed Central

    Guo, L.; Wang, X. Q.; Zheng, X. T.; Yang, X. L.; Xu, F. J.; Tang, N.; Lu, L. W.; Ge, W. K.; Shen, B.; Dmowski, L. H.; Suski, T.

    2014-01-01

    We report evidence of the transition from n- to p-type conduction of InN with increasing Mg dopant concentration by using photoconductivity (PC) measurement at room temperature. This transition is depicted as a conversion from negative to positive PC under above-bandgap optical excitation. The n- to p-type transition in InN:Mg is further confirmed by thermopower measurements. PC detection method is a bulk effect since the optical absorption of the surface electron accumulation is negligibly low due to its rather small thickness, and thus shows advantage to detect p-type conduction. This technique is certainly helpful to study p-type doping of InN, which is still a subject of discussions. PMID:24621830

  9. Sputtering deposition of P-type SnO films with SnO₂ target in hydrogen-containing atmosphere.

    PubMed

    Hsu, Po-Ching; Hsu, Chao-Jui; Chang, Ching-Hsiang; Tsai, Shiao-Po; Chen, Wei-Chung; Hsieh, Hsing-Hung; Wu, Chung-Chih

    2014-08-27

    In this work, we had investigated sputtering deposition of p-type SnO using the widely used and robust SnO2 target in a hydrogen-containing reducing atmosphere. The effects of the hydrogen-containing sputtering gas on structures, compositions, optical, and electrical properties of deposited SnOx films were studied. Results show that polycrystalline and SnO-dominant films could be readily obtained by carefully controlling the hydrogen gas ratio in the sputtering gas and the extent of reduction reaction. P-type conductivity was unambiguously observed for SnO-dominant films with traceable Sn components, exhibiting a p-type Hall mobility of up to ∼3 cm(2) V(-1) s(-1). P-type SnO thin-film transistors using such SnO-dominant films were also demonstrated.

  10. Analysis of Radiation Effects in Silicon using Kinetic Monte Carlo Methods

    DOE PAGES

    Hehr, Brian Douglas

    2014-11-25

    The transient degradation of semiconductor device performance under irradiation has long been an issue of concern. Neutron irradiation can instigate the formation of quasi-stable defect structures, thereby introducing new energy levels into the bandgap that alter carrier lifetimes and give rise to such phenomena as gain degradation in bipolar junction transistors. Normally, the initial defect formation phase is followed by a recovery phase in which defect-defect or defect-dopant interactions modify the characteristics of the damaged structure. A kinetic Monte Carlo (KMC) code has been developed to model both thermal and carrier injection annealing of initial defect structures in semiconductor materials.more » The code is employed to investigate annealing in electron-irradiated, p-type silicon as well as the recovery of base current in silicon transistors bombarded with neutrons at the Los Alamos Neutron Science Center (LANSCE) “Blue Room” facility. Our results reveal that KMC calculations agree well with these experiments once adjustments are made, within the appropriate uncertainty bounds, to some of the sensitive defect parameters.« less

  11. Analysis of Radiation Effects in Silicon using Kinetic Monte Carlo Methods

    SciTech Connect

    Hehr, Brian Douglas

    2014-11-25

    The transient degradation of semiconductor device performance under irradiation has long been an issue of concern. Neutron irradiation can instigate the formation of quasi-stable defect structures, thereby introducing new energy levels into the bandgap that alter carrier lifetimes and give rise to such phenomena as gain degradation in bipolar junction transistors. Normally, the initial defect formation phase is followed by a recovery phase in which defect-defect or defect-dopant interactions modify the characteristics of the damaged structure. A kinetic Monte Carlo (KMC) code has been developed to model both thermal and carrier injection annealing of initial defect structures in semiconductor materials. The code is employed to investigate annealing in electron-irradiated, p-type silicon as well as the recovery of base current in silicon transistors bombarded with neutrons at the Los Alamos Neutron Science Center (LANSCE) “Blue Room” facility. Our results reveal that KMC calculations agree well with these experiments once adjustments are made, within the appropriate uncertainty bounds, to some of the sensitive defect parameters.

  12. Optically initiated silicon carbide high voltage switch

    SciTech Connect

    Caporaso, George J; Sampayan, Stephen E; Sullivan, James S; Sanders,; David, M

    2011-02-22

    An improved photoconductive switch having a SiC or other wide band gap substrate material, such as GaAs and field-grading liners composed of preferably SiN formed on the substrate adjacent the electrode perimeters or adjacent the substrate perimeters for grading the electric fields.

  13. Evaluation of transition metal oxide as carrier-selective contacts for silicon heterojunction solar cells

    SciTech Connect

    Ding, L.; Boccard, Matthieu; Holman, Zachary; Bertoni, M.

    2015-04-06

    "Reducing light absorption in the non-active solar cell layers, while enabling the extraction of the photogenerated minority carriers at quasi-Fermi levels are two key factors to improve current generation and voltage, and therefore efficiency of silicon heterojunction solar devices. To address these two critical aspects, transition metal oxide materials have been proposed as alternative to the n- and p-type amorphous silicon used as electron and hole selective contacts, respectively. Indeed, transition metal oxides such as molybdenum oxide, titanium oxide, nickel oxide or tungsten oxide combine a wide band gap typically over 3 eV with a band structure and theoretical band alignment with silicon that results in high transparency to the solar spectrum and in selectivity for the transport of only one carrier type. Improving carrier extraction or injection using transition metal oxide has been a topic of investigation in the field of organic solar cells and organic LEDs; from these pioneering works a lot of knowledge has been gained on materials properties, ways to control these during synthesis and deposition, and their impact on device performance. Recently, the transfer of some of this knowledge to silicon solar cells and the successful application of some metal oxide to contact heterojunction devices have gained much attention. In this contribution, we investigate the suitability of various transition metal oxide films (molybdenum oxide, titanium oxide, and tungsten oxide) deposited either by thermal evaporation or sputtering as transparent hole or electron selective transport layer for silicon solar cells. In addition to systematically characterize their optical and structural properties, we use photoemission spectroscopy to relate compound stoichiometry to band structure and characterize band alignment to silicon. The direct silicon/metal oxide interface is further analyzed by quasi-steady state photoconductance decay method to assess the quality of surface

  14. Method for enhancing the solubility of boron and indium in silicon

    DOEpatents

    Sadigh, Babak; Lenosky, Thomas J.; Diaz de la Rubia, Tomas; Giles, Martin; Caturla, Maria-Jose; Ozolins, Vidvuds; Asta, Mark; Theiss, Silva; Foad, Majeed; Quong, Andrew

    2002-01-01

    A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100.degree. C.; and for indium, a 1% tensile strain at 1100.degree. C., corresponds to an enhancement of the solubility by 200%.

  15. 22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

    SciTech Connect

    Geissbühler, Jonas Werner, Jérémie; Martin de Nicolas, Silvia; Hessler-Wyser, Aïcha; Tomasi, Andrea; Niesen, Bjoern; De Wolf, Stefaan; Barraud, Loris; Despeisse, Matthieu; Nicolay, Sylvain; Ballif, Christophe

    2015-08-24

    Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 °C—often needed for the curing of printed metal contacts—detrimentally impacts hole collection of such devices. We circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.

  16. 22.5% efficient silicon heterojunction solar cell with molybdenum oxide hole collector

    SciTech Connect

    Geissbühler, Jonas; Werner, Jérémie; Nicolas, Silvia Martin de; Barraud, Loris; Hessler-Wyser, Aïcha; Despeisse, Matthieu; Nicolay, Sylvain; Tomasi, Andrea; Niesen, Bjoern; De Wolf, Stefaan; Ballif, Christophe

    2015-08-24

    Substituting the doped amorphous silicon films at the front of silicon heterojunction solar cells with wide-bandgap transition metal oxides can mitigate parasitic light absorption losses. This was recently proven by replacing p-type amorphous silicon with molybdenum oxide films. In this article, we evidence that annealing above 130 °C—often needed for the curing of printed metal contacts—detrimentally impacts hole collection of such devices. Furthermore, we circumvent this issue by using electrodeposited copper front metallization and demonstrate a silicon heterojunction solar cell with molybdenum oxide hole collector, featuring a fill factor value higher than 80% and certified energy conversion efficiency of 22.5%.

  17. Few-Layer MoS₂ p-Type Devices Enabled by Selective Doping Using Low Energy Phosphorus Implantation.

    PubMed

    Nipane, Ankur; Karmakar, Debjani; Kaushik, Naveen; Karande, Shruti; Lodha, Saurabh

    2016-02-23

    P-type doping of MoS2 has proved to be a significant bottleneck in the realization of fundamental devices such as p-n junction diodes and p-type transistors due to its intrinsic n-type behavior. We report a CMOS compatible, controllable and area selective phosphorus plasma immersion ion implantation (PIII) process for p-type doping of MoS2. Physical characterization using SIMS, AFM, XRD and Raman techniques was used to identify process conditions with reduced lattice defects as well as low surface damage and etching, 4X lower than previous plasma based doping reports for MoS2. A wide range of nondegenerate to degenerate p-type doping is demonstrated in MoS2 field effect transistors exhibiting dominant hole transport. Nearly ideal and air stable, lateral homogeneous p-n junction diodes with a gate-tunable rectification ratio as high as 2 × 10(4) are demonstrated using area selective doping. Comparison of XPS data from unimplanted and implanted MoS2 layers shows a shift of 0.67 eV toward lower binding energies for Mo and S peaks indicating p-type doping. First-principles calculations using density functional theory techniques confirm p-type doping due to charge transfer originating from substitutional as well as physisorbed phosphorus in top few layers of MoS2. Pre-existing sulfur vacancies are shown to enhance the doping level significantly.

  18. Ferromagnetic ordering of Cr and Fe doped p-type diamond: An ab initio study

    SciTech Connect

    Benecha, E. M.; Lombardi, E. B.

    2014-02-21

    Ferromagnetic ordering of transition metal dopants in semiconductors holds the prospect of combining the capabilities of semiconductors and magnetic systems in single hybrid devices for spintronic applications. Various semiconductors have so far been considered for spintronic applications, but low Curie temperatures have hindered room temperature applications. We report ab initio DFT calculations on the stability and magnetic properties of Fe and Cr impurities in diamond, and show that their ground state magnetic ordering and stabilization energies depend strongly on the charge state and type of co-doping. We predict that divacancy Cr{sup +2} and substitutional Fe{sup +1} order ferromagnetically in p-type diamond, with magnetic stabilization energies (and magnetic moment per impurity ion) of 16.9 meV (2.5 μ{sub B}) and 33.3 meV (1.0 μ{sub B}), respectively. These magnetic stabilization energies are much larger than what has been achieved in other semiconductors at comparable impurity concentrations, including the archetypal dilute magnetic semiconductor GaAs:Mn. In addition, substitutional Fe{sup +1} exhibits a strong half-metallic character, with the Fermi level crossing bands in only the spin down channel. These results, combined with diamond’s extreme properties, demonstrate that Cr or Fe dopedp-type diamond may successfully be considered in the search for room temperature spintronic materials.

  19. Near Field Enhanced Photocurrent Generation in P-type Dye-Sensitized Solar Cells

    PubMed Central

    Xu, Xiaobao; Cui, Jin; Han, Junbo; Zhang, Junpei; Zhang, Yibo; Luan, Lin; Alemu, Getachew; Wang, Zhong; Shen, Yan; Xiong, Dehua; Chen, Wei; Wei, Zhanhua; Yang, Shihe; Hu, Bin; Cheng, Yibing; Wang, Mingkui

    2014-01-01

    Over the past few decades, the field of p-type dye-sensitized solar cell (p-DSSC) devices has undergone tremendous advances, in which Cu-based delafossite nanocrystal is of prime interest. This paper presents an augment of about 87% improvement in photocurrent observed in a particular configuration of organic dye P1 sensitized CuCrO2 delafossite nanocrystal electrode coupled with organic redox shuttle, 1-methy-1H- tetrazole-5-thiolate and its disulfide dimer when Au nanoparticles (NPs, with diameter of about 20 nm) is added into the photocathode, achieving a power convert efficiency of 0.31% (measured under standard AM 1.5 G test conditions). Detailed investigation shows that the local electrical-magnetic field effect, induced by Au NPs among the mesoporous CuCrO2 film, can improve the charge injection efficiency at dye/semiconductor interface, which is responsible for the bulk of the gain in photocurrent. PMID:24492539

  20. Observations of exciton and carrier spin relaxation in Be doped p-type GaAs

    SciTech Connect

    Asaka, Naohiro; Harasawa, Ryo; Tackeuchi, Atsushi; Lu, Shulong; Dai, Pan

    2014-03-17

    We have investigated the exciton and carrier spin relaxation in Be-doped p-type GaAs. Time-resolved spin-dependent photoluminescence (PL) measurements revealed spin relaxation behaviors between 10 and 100 K. Two PL peaks were observed at 1.511 eV (peak 1) and 1.497 eV (peak 2) at 10 K, and are attributed to the recombination of excitons bound to neutral Be acceptors (peak 1) and the band-to-acceptor transition (peak 2). The spin relaxation times of both PL peaks were measured to be 1.3–3.1 ns at 10–100 K, and found to originate from common electron spin relaxation. The observed existence of a carrier density dependence of the spin relaxation time at 10–77 K indicates that the Bir-Aronov-Pikus process is the dominant spin relaxation mechanism.

  1. SIM Lite Detection of Habitable Planets in P-Type Binary-Planetary Systems

    NASA Technical Reports Server (NTRS)

    Pan, Xiaopei; Shao, Michael; Shaklan, Stuart; Goullioud, Renaud

    2010-01-01

    Close binary stars like spectroscopic binaries create a completely different environment than single stars for the evolution of a protoplanetary disk. Dynamical interactions between one star and protoplanets in such systems provide more challenges for theorists to model giant planet migration and formation of multiple planets. For habitable planets the majority of host stars are in binary star systems. So far only a small amount of Jupiter-size planets have been discovered in binary stars, whose minimum separations are 20 AU and the median value is about 1000 AU (because of difficulties in radial velocity measurements). The SIM Lite mission, a space-based astrometric observatory, has a unique capability to detect habitable planets in binary star systems. This work analyzed responses of the optical system to the field stop for companion stars and demonstrated that SIM Lite can observe exoplanets in visual binaries with small angular separations. In particular we investigated the issues for the search for terrestrial planets in P-type binary-planetary systems, where the planets move around both stars in a relatively distant orbit.

  2. Plasmodium P-Type Cyclin CYC3 Modulates Endomitotic Growth during Oocyst Development in Mosquitoes.

    PubMed

    Roques, Magali; Wall, Richard J; Douglass, Alexander P; Ramaprasad, Abhinay; Ferguson, David J P; Kaindama, Mbinda L; Brusini, Lorenzo; Joshi, Nimitray; Rchiad, Zineb; Brady, Declan; Guttery, David S; Wheatley, Sally P; Yamano, Hiroyuki; Holder, Anthony A; Pain, Arnab; Wickstead, Bill; Tewari, Rita

    2015-11-01

    Cell-cycle progression and cell division in eukaryotes are governed in part by the cyclin family and their regulation of cyclin-dependent kinases (CDKs). Cyclins are very well characterised in model systems such as yeast and human cells, but surprisingly little is known about their number and role in Plasmodium, the unicellular protozoan parasite that causes malaria. Malaria parasite cell division and proliferation differs from that of many eukaryotes. During its life cycle it undergoes two types of mitosis: endomitosis in asexual stages and an extremely rapid mitotic process during male gametogenesis. Both schizogony (producing merozoites) in host liver and red blood cells, and sporogony (producing sporozoites) in the mosquito vector, are endomitotic with repeated nuclear replication, without chromosome condensation, before cell division. The role of specific cyclins during Plasmodium cell proliferation was unknown. We show here that the Plasmodium genome contains only three cyclin genes, representing an unusual repertoire of cyclin classes. Expression and reverse genetic analyses of the single Plant (P)-type cyclin, CYC3, in the rodent malaria parasite, Plasmodium berghei, revealed a cytoplasmic and nuclear location of the GFP-tagged protein throughout the lifecycle. Deletion of cyc3 resulted in defects in size, number and growth of oocysts, with abnormalities in budding and sporozoite formation. Furthermore, global transcript analysis of the cyc3-deleted and wild type parasites at gametocyte and ookinete stages identified differentially expressed genes required for signalling, invasion and oocyst development. Collectively these data suggest that cyc3 modulates oocyst endomitotic development in Plasmodium berghei.

  3. Growth of antimony doped P-type zinc oxide nanowires for optoelectronics

    DOEpatents

    Wang, Zhong Lin; Pradel, Ken

    2016-09-27

    In a method of growing p-type nanowires, a nanowire growth solution of zinc nitrate (Zn(NO.sub.3).sub.2), hexamethylenetetramine (HMTA) and polyethylenemine (800 M.sub.w PEI) is prepared. A dopant solution to the growth solution, the dopant solution including an equal molar ration of sodium hydroxide (NaOH), glycolic acid (C.sub.2H.sub.4O.sub.3) and antimony acetate (Sb(CH.sub.3COO).sub.3) in water is prepared. The dopant solution and the growth solution combine to generate a resulting solution that includes antimony to zinc in a ratio of between 0.2% molar to 2.0% molar, the resulting solution having a top surface. An ammonia solution is added to the resulting solution. A ZnO seed layer is applied to a substrate and the substrate is placed into the top surface of the resulting solution with the ZnO seed layer facing downwardly for a predetermined time until Sb-doped ZnO nanowires having a length of at least 5 .mu.m have grown from the ZnO seed layer.

  4. Interstitial oxygen as a source of p-type conductivity in hexagonal manganites

    NASA Astrophysics Data System (ADS)

    Skjærvø, Sandra H.; Wefring, Espen T.; Nesdal, Silje K.; Gaukås, Nikolai H.; Olsen, Gerhard H.; Glaum, Julia; Tybell, Thomas; Selbach, Sverre M.

    2016-12-01

    Hexagonal manganites, h-RMnO3 (R=Sc, Y, Ho-Lu), have been intensively studied for their multiferroic properties, magnetoelectric coupling, topological defects and electrically conducting domain walls. Although point defects strongly affect the conductivity of transition metal oxides, the defect chemistry of h-RMnO3 has received little attention. We use a combination of experiments and first principles electronic structure calculations to elucidate the effect of interstitial oxygen anions, Oi, on the electrical and structural properties of h-YMnO3. Enthalpy stabilized interstitial oxygen anions are shown to be the main source of p-type electronic conductivity, without reducing the spontaneous ferroelectric polarization. A low energy barrier interstitialcy mechanism is inferred from Density Functional Theory calculations to be the microscopic migration path of Oi. Since the Oi content governs the concentration of charge carrier holes, controlling the thermal and atmospheric history provides a simple and fully reversible way of tuning the electrical properties of h-RMnO3.

  5. Ferromagnetic ordering of Cr and Fe doped p-type diamond: An ab initio study

    NASA Astrophysics Data System (ADS)

    Benecha, E. M.; Lombardi, E. B.

    2014-02-01

    Ferromagnetic ordering of transition metal dopants in semiconductors holds the prospect of combining the capabilities of semiconductors and magnetic systems in single hybrid devices for spintronic applications. Various semiconductors have so far been considered for spintronic applications, but low Curie temperatures have hindered room temperature applications. We report ab initio DFT calculations on the stability and magnetic properties of Fe and Cr impurities in diamond, and show that their ground state magnetic ordering and stabilization energies depend strongly on the charge state and type of co-doping. We predict that divacancy Cr+2 and substitutional Fe+1 order ferromagnetically in p-type diamond, with magnetic stabilization energies (and magnetic moment per impurity ion) of 16.9 meV (2.5 μB) and 33.3 meV (1.0 μB), respectively. These magnetic stabilization energies are much larger than what has been achieved in other semiconductors at comparable impurity concentrations, including the archetypal dilute magnetic semiconductor GaAs:Mn. In addition, substitutional Fe+1 exhibits a strong half-metallic character, with the Fermi level crossing bands in only the spin down channel. These results, combined with diamond's extreme properties, demonstrate that Cr or Fe dopedp-type diamond may successfully be considered in the search for room temperature spintronic materials.

  6. Towards P-Type Conductivity in SnO2 Nanocrystals through Li Doping

    SciTech Connect

    Chaparadza, Allen; Rananavare, Shankar B

    2010-01-22

    This paper examines electrical transport properties and Li doping in SnO2 synthesized by the sol–gel method. Solid-state 7Li-NMR lineshapes reveal that Li ions occupy two distinct sites with differing dynamic mobilities. The chemical exchange rate between the two sites is, however, too slow for detection on the NMR timescale. Compressed nanoparticulate films of this doped semiconductor exhibit a positive Seebeck coefficient implying a p-type conductivity. A variable-temperature direct current conductivity, over a 25–350 °C temperature range, follows an Efros–Shklovskii variable range hopping (ES-VRH) conduction mechanism (ln(ρ) versus T -1/2) at temperatures below 100 °C with a crossover to 2D Mott variable range hopping (M-VRH) (ln(ρ) versus T -1/3) conduction at temperatures above 250 °C. In a transition region between these two limiting behaviors, the dc resistivity exhibits an anomalous temperature-independent plateau. We suggest that its origin may lie in a carrier inversion phenomenon wherein the majority carriers switch from holes to electrons due to Li ion expulsion from the crystalline core and creation of oxygen vacancies generated by loss of oxygen at elevated temperatures.

  7. High-Performance p-Type Black Phosphorus Transistor with Scandium Contact.

    PubMed

    Li, Ling; Engel, Michael; Farmer, Damon B; Han, Shu-Jen; Wong, H-S Philip

    2016-04-26

    A record high current density of 580 μA/μm is achieved for long-channel, few-layer black phosphorus transistors with scandium contacts after 400 K vacuum annealing. The annealing effectively improves the on-state current and Ion/Ioff ratio by 1 order of magnitude and the subthreshold swing by ∼2.5×, whereas Al2O3 capping significantly degrades transistor performances, resulting in 5× lower on-state current and 3× lower Ion/Ioff ratio. The influences of moisture on black phosphorus metal contacts are elucidated by analyzing the hysteresis of 3-20 nm thick black phosphorus transistors with scandium and gold contacts under different conditions: as-fabricated, after vacuum annealing, and after Al2O3 capping. The optimal black phosphorus film thickness for transistors with scandium contacts is found to be ∼10 nm. Moreover, p-type performance is shown in all transistors with scandium contacts, suggesting that the Fermi level is pinned closer to the valence band regardless of the flake thickness.

  8. Raman scattering studies of p-type Sb-doped ZnO thin films

    NASA Astrophysics Data System (ADS)

    Samanta, Kousik; Bhattacharya, Pijush; Katiyar, Ram S.

    2010-12-01

    Antimony doped p-type ZnO films were grown on Al2O3 (0001) substrate by pulsed laser deposition. The structural properties of Zn1-xSbxO (3% and 5%) thin films were investigated by Raman scattering studies. The softening of local lattice due to the formation of (SbZn-2VZn) acceptor complexes was detected as the shift in E2high mode toward lower frequency side in ZnSbO thin films. Additional optical modes observed at 277, 333, 483, and 534 cm-1 are due to the breaking of translational symmetry in w-ZnO by Sb doping. The Zn-Sb related local vibrational mode was detected around 237 cm-1 in 5% Sb doped ZnO thin film. Room temperature Hall measurements exhibited low resistivity of 0.017 Ω cm, high hole concentration of 6.25×1018 cm-3, and mobility of 57.44 cm2/V s in the 5% Sb-doped ZnO thin film.

  9. High-throughput search of ternary chalcogenides for p-type transparent electrodes

    PubMed Central

    Shi, Jingming; Cerqueira, Tiago F. T.; Cui, Wenwen; Nogueira, Fernando; Botti, Silvana; Marques, Miguel A. L.

    2017-01-01

    Delafossite crystals are fascinating ternary oxides that have demonstrated transparent conductivity and ambipolar doping. Here we use a high-throughput approach based on density functional theory to find delafossite and related layered phases of composition ABX2, where A and B are elements of the periodic table, and X is a chalcogen (O, S, Se, and Te). From the 15 624 compounds studied in the trigonal delafossite prototype structure, 285 are within 50 meV/atom from the convex hull of stability. These compounds are further investigated using global structural prediction methods to obtain their lowest-energy crystal structure. We find 79 systems not present in the materials project database that are thermodynamically stable and crystallize in the delafossite or in closely related structures. These novel phases are then characterized by calculating their band gaps and hole effective masses. This characterization unveils a large diversity of properties, ranging from normal metals, magnetic metals, and some candidate compounds for p-type transparent electrodes. PMID:28266587

  10. P-type InGaAsP coolers for integrated optic devices

    NASA Astrophysics Data System (ADS)

    Vashaee, Daryoosh; LaBounty, Christopher J.; Fang, Xiaofeng; Zeng, Gehong; Abraham, Patrick; Bowers, John E.; Shakouri, Ali

    2001-05-01

    Single stage thin film coolers based on thermoelectric and thermionic cooling in p-type InGaAsP superlattice structures have been fabricated. Devices with different sizes and at various ambient temperatures have been characterized. Experimental results showed 0.5 degree centigrade cooling below the ambient temperature at 25C. This cooling over 1 4mu2m thick superlattice barrier corresponds to cooling power densities on the order of 200 W/cm2. The device cools by a factor of two better at higher temperatures (70C). This is due to the reduction of the superlattice thermal conductivity and the broadening of the electronic distribution function at higher temperatures. 150x150 micrometers 2 devices provide largest cooling at room temperature while the optimum device size shrinks as the temperature increases. Simulations results that take into account finite thermal resistance of the InP substrate, the effect of the contact resistance, heat generation in the wire-bonds and metallic pads on top of the device predict accurately the optimum cooling of these micro refrigerators. By eliminating the major parasitic sources of heating (Joule heating in the substrate, heat conduction through the side contact and reducing the contact resistance to 5x7-7 ohm-cm2) simulations show that, ultimately, one can achieve 15 degree(s)C cooling (10's of kW/cm2 cooling power) with single stage p-InGaAsP thin film coolers.

  11. High-throughput search of ternary chalcogenides for p-type transparent electrodes.

    PubMed

    Shi, Jingming; Cerqueira, Tiago F T; Cui, Wenwen; Nogueira, Fernando; Botti, Silvana; Marques, Miguel A L

    2017-03-07

    Delafossite crystals are fascinating ternary oxides that have demonstrated transparent conductivity and ambipolar doping. Here we use a high-throughput approach based on density functional theory to find delafossite and related layered phases of composition ABX2, where A and B are elements of the periodic table, and X is a chalcogen (O, S, Se, and Te). From the 15 624 compounds studied in the trigonal delafossite prototype structure, 285 are within 50 meV/atom from the convex hull of stability. These compounds are further investigated using global structural prediction methods to obtain their lowest-energy crystal structure. We find 79 systems not present in the materials project database that are thermodynamically stable and crystallize in the delafossite or in closely related structures. These novel phases are then characterized by calculating their band gaps and hole effective masses. This characterization unveils a large diversity of properties, ranging from normal metals, magnetic metals, and some candidate compounds for p-type transparent electrodes.

  12. Growth of p-type ZnOS films by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Kobayashi, Kenkichiro; Ohtsuki, Tohru; Tomita, Yasumasa; Kohno, Yosiumi; Maeda, Yasuhisa; Matsushima, Shigenori

    2017-01-01

    ZnO1-xSx films were deposited on quartz substrates by pulsed laser deposition (PLD) of ZnO1-xSx targets. The ZnO1-xSx films with S-contents of 0.03-0.17 were grown from the ZnO1-xSx targets sulfured at temperatures of 200 and 500 °C. The resistivity of the ZnO1-xSx films is slightly increased with the S-content. An increase of the O2-partial pressure in an atmosphere reduces the S-content in the films and drastically enhances the resistivity of the films. However, the carrier type of the films is still n-type. In order to incorporate excess S atoms into films, evaporation of Sulfur was performed during the PLD process. As a temperature of the S-evaporation is raised, the resistivity of the films is significantly enhanced and hole-conductivity appears in the films grown by the S-evaporation at 80 and 90 °C. By X-ray photoelectron spectroscopic measurements, the presence of SOx species is confirmed for the p-type ZnO1-xSx film. Both interstitial SO3 or SO4 clusters and complexes of Zn-vacancy with H are considered to be appropriate acceptors responsible for the hole-conductivity at room temperature.

  13. Robust p-type doping of copper oxide using nitrogen implantation

    NASA Astrophysics Data System (ADS)

    Jorge, Marina; Polyakov, Stanislav M.; Cooil, Simon; Schenk, Alex K.; Edmonds, Mark; Thomsen, Lars; Mazzola, Federico; Wells, Justin W.

    2017-07-01

    We demonstrate robust p-type doping of Cu2O using low/medium energy ion implantation. Samples are made by controlled oxidation of annealed Cu metal foils, which results in Cu2O with levels of doping close to intrinsic. Samples are then implanted with nitrogen ions using a kinetic energy in the few keV range. Using this method, we are able to produce very high levels of doping, as evidenced by a 350 meV shift in the Fermi level towards the VB maximum. The robustness of the nitrogen implanted samples are tested by exposing them to atmospheric contaminants, and elevated temperatures. The samples are found to survive an increase in temperature of many hundreds of degrees. The robustness of the samples, combined with the fact that the materials used are safe, abundant and non-toxic and that the methods used for the growth of Cu2O and N+ implantation are simple and cheap to implement industrially, underlines the potential of Cu2O:N for affordable intermediate band photovoltaics.

  14. Enhanced thermoelectric figure of merit of p-type half-Heuslers.

    PubMed

    Yan, Xiao; Joshi, Giri; Liu, Weishu; Lan, Yucheng; Wang, Hui; Lee, Sangyeop; Simonson, J W; Poon, S J; Tritt, T M; Chen, Gang; Ren, Z F

    2011-02-09

    Half-Heuslers would be important thermoelectric materials due to their high temperature stability and abundance if their dimensionless thermoelectric figure of merit (ZT) could be made high enough. The highest peak ZT of a p-type half-Heusler has been so far reported about 0.5 due to the high thermal conductivity. Through a nanocomposite approach using ball milling and hot pressing, we have achieved a peak ZT of 0.8 at 700 °C, which is about 60% higher than the best reported 0.5 and might be good enough for consideration for waste heat recovery in car exhaust systems. The improvement comes from a simultaneous increase in Seebeck coefficient and a significant decrease in thermal conductivity due to nanostructures. The samples were made by first forming alloyed ingots using arc melting and then creating nanopowders by ball milling the ingots and finally obtaining dense bulk by hot pressing. Further improvement in ZT is expected when average grain sizes are made smaller than 100 nm.

  15. Heavy hole effect on the thermoelectric properties of highly doped p-type lead telluride

    NASA Astrophysics Data System (ADS)

    Babenko, N. I.; Dmitriev, A. V.

    2017-01-01

    We study theoretically the thermoelectric properties of heavily doped p-type PbTe in the temperature interval of 300 to 900 K. In our calculations, we use the three-band model of PbTe electron energy spectrum that takes into account the heavy-hole Σ-band. On the base of the Boltzmann kinetic equation, the full set of the relevant kinetic characteristics is calculated including the electrical and thermal conductivities, the Seebeck coefficient, and the thermoelectric figure-of-merit. The thermoelectric characteristics appear to be very sensitive to parameters of the heavy hole band. The best fit with experiment was obtained at mh h=5 m0 and Eg Σ=0.5 eV. All calculated thermoelectric quantities then agree very well with the available experimental data. In particular, we were able to reproduce the significant increase of the figure-of-merit up to Z T ≈1.2 that was experimentally observed recently in heavily p-doped PbTe. Our results show that ZT maximum corresponds to the temperature wherein the light hole and heavy hole band edges coincide so that a prominent density-of-states singularity is formed in the valence band.

  16. Interstitial oxygen as a source of p-type conductivity in hexagonal manganites

    PubMed Central

    Skjærvø, Sandra H.; Wefring, Espen T.; Nesdal, Silje K.; Gaukås, Nikolai H.; Olsen, Gerhard H.; Glaum, Julia; Tybell, Thomas; Selbach, Sverre M.

    2016-01-01

    Hexagonal manganites, h-RMnO3 (R=Sc, Y, Ho–Lu), have been intensively studied for their multiferroic properties, magnetoelectric coupling, topological defects and electrically conducting domain walls. Although point defects strongly affect the conductivity of transition metal oxides, the defect chemistry of h-RMnO3 has received little attention. We use a combination of experiments and first principles electronic structure calculations to elucidate the effect of interstitial oxygen anions, Oi, on the electrical and structural properties of h-YMnO3. Enthalpy stabilized interstitial oxygen anions are shown to be the main source of p-type electronic conductivity, without reducing the spontaneous ferroelectric polarization. A low energy barrier interstitialcy mechanism is inferred from Density Functional Theory calculations to be the microscopic migration path of Oi. Since the Oi content governs the concentration of charge carrier holes, controlling the thermal and atmospheric history provides a simple and fully reversible way of tuning the electrical properties of h-RMnO3. PMID:27924812

  17. Raman Spectroscopy Determination of Hole Concentration in p-Type GaSb

    SciTech Connect

    Maslar JE, Hurst WS, Wang CA

    2007-04-05

    Room temperature p-type GaSb bulk coupled mode spectra were measured as a function of hole concentration. These spectra were obtained using an optical system based on 752.55 nm excitation in order to obtain more sensitivity to bulk GaSb coupled mode scattering than possible with visible wavelength excitation-based systems. A relatively simple spectral model for the electronic contribution to the dielectric function was evaluated for determination of hole concentration from the bulk coupled mode spectra. Optically-derived values for hole concentration were determined by minimizing the sum of the residuals squared between an experimental and simulated spectrum as a function of total hole concentration and a plasmon damping parameter. Hole concentrations obtained from the Raman spectroscopic measurements deviated from the values determined from single field Hall effect measurements that were corrected to account for two band conduction by {approx}20% to {approx}65%. These deviations were attributed to the limitations of the spectral model employed and uncertainties in GaSb materials properties.

  18. ZnTe Alloying Effect on Enhanced Thermoelectric Properties of p-Type PbTe.

    PubMed

    Ahn, Kyunghan; Shin, Hocheol; Im, Jino; Park, Sang Hyun; Chung, In

    2017-02-01

    We investigate the effect of ZnTe incorporation on PbTe to enhance thermoelectric performance. We report structural, microscopic, and spectroscopic characterizations, ab initio theoretical calculations, and thermoelectric transport properties of Pb0.985Na0.015Te-x% ZnTe (x = 0, 1, 2, 4). We find that the solid solubility limit of ZnTe in PbTe is less than 1 mol %. The introduction of 2% ZnTe in p-type Pb0.985Na0.015Te reduces the lattice thermal conductivity through the ZnTe precipitates at the microscale. Consequently, a maximum thermoelectric figure of merit (ZT) of 1.73 at 700 K is achieved for the spark plasma-sintered Pb0.985Na0.015Te-2% ZnTe, which arises from a decreased lattice thermal conductivity of ∼0.69 W m(-1) K(-1) at ∼700 K in comparison with Pb0.985Na0.015Te.

  19. Influence of Sodium Chloride Doping on Thermoelectric Properties of p-type SnSe

    NASA Astrophysics Data System (ADS)

    Yang, Shi Dan; Nutor, Raymond Kwesi; Chen, Zi Jie; Zheng, Hao; Wu, Hai Fei; Si, Jian Xiao

    2017-08-01

    We investigated the effect of NaCl doping on the thermoelectric properties of p-type Sn 1-x Na x SeCl x (x = 0, 0.005, 0.01, 0.02, 0.03 and 0.04) prepared by a method which combines rapid induction melting and rapid hot pressing. After introducing the NaCl into the SnSe system, the carrier concentration of SnSe is significantly increased from ˜4.55 × 1017 cm-3 to ˜3.95 × 1019 cm-3 at 300 K. An electrical conductivity of ˜102.5 S cm-1 was obtained at 473 K by addition of 2 mol.% NaCl. It was found that Cl was effective in reducing the thermal conductivity by inducing abundant defects. A maximum ZT value of 0.84 was achieved in the Na0.005Sn0.995SeCl0.005 sample at 810 K. This suggests that doping with NaCl is a facile and cost-effective method in optimizing the thermoelectric properties of SnSe materials.

  20. Quasiparticle band structures and thermoelectric transport properties of p-type SnSe

    SciTech Connect

    Shi, Guangsha; Kioupakis, Emmanouil

    2015-02-14

    We used density functional and many-body perturbation theory to calculate the quasiparticle band structures and electronic transport parameters of p-type SnSe both for the low-temperature Pnma and high-temperature Cmcm phases. The Pnma phase has an indirect band gap of 0.829 eV, while the Cmcm has a direct band gap of 0.464 eV. Both phases exhibit multiple local band extrema within an energy range comparable to the thermal energy of carriers from the global extrema. We calculated the electronic transport coefficients as a function of doping concentration and temperature for single-crystal and polycrystalline materials to understand the previous experimental measurements. The electronic transport coefficients are highly anisotropic and are strongly affected by bipolar transport effects at high temperature. Our results indicate that SnSe exhibits optimal thermoelectric performance at high temperature when doped in the 10{sup 19}–10{sup 20 }cm{sup −3} range.

  1. Enhanced p-type conduction of B-doped nanocrystalline diamond films by high temperature annealing

    SciTech Connect

    Gu, S. S.; Hu, X. J.

    2013-07-14

    We report the enhanced p-type conduction with Hall mobility of 53.3 cm{sup 2} V{sup -1} s{sup -1} in B-doped nanocrystalline diamond (NCD) films by 1000 Degree-Sign C annealing. High resolution transmission electronic microscopy, uv, and visible Raman spectroscopy measurements show that a part of amorphous carbon grain boundaries (GBs) transforms to diamond phase, which increases the opportunity of boron atoms located at the GBs to enter into the nano-diamond grains. This phase transition doping is confirmed by the secondary ion mass spectrum depth profile results that the concentration of B atoms in nano-diamond grains increases after 1000 Degree-Sign C annealing. It is also observed that 1000 Degree-Sign C annealing improves the lattice perfection, reduces the internal stress, decreases the amount of trans-polyacetylene, and increases the number or size of aromatic rings in the sp{sup 2}-bonded carbon cluster in B-doped NCD films. These give the contributions to improve the electrical properties of 1000 Degree-Sign C annealed B-doped NCD films.

  2. Improved source design for p-type tunnel field-effect transistors: Towards truly complementary logic

    NASA Astrophysics Data System (ADS)

    Verreck, Devin; Verhulst, Anne S.; Sorée, Bart; Collaert, Nadine; Mocuta, Anda; Thean, Aaron; Groeseneken, Guido

    2014-12-01

    Complementary logic based on tunnel field-effect transistors (TFETs) would drastically reduce power consumption thanks to the TFET's potential to obtain a sub-60 mV/dec subthreshold swing (SS). However, p-type TFETs typically do not meet the performance of n-TFETs for direct bandgap III-V configurations. The p-TFET SS stays well above 60 mV/dec, due to the low density of states in the conduction band. We therefore propose a source configuration in which a highly doped region is maintained only near the tunnel junction. In the remaining part of the source, the hot carriers in the exponential tail of the Fermi-Dirac distribution are blocked by reducing the doping degeneracy, either with a source section with a lower doping concentration or with a heterostructure. We apply this concept to n-p-i-p configurations consisting of In0.53Ga0.47As and an InP-InAs heterostructure. 15-band quantum mechanical simulations predict that the configurations with our source design can obtain sub-60 mV/dec SS, with an on-current comparable to the conventional source design.

  3. Photoluminescence studies of compensated p-type ZnSe:N(P) under hydrostatic pressure

    NASA Astrophysics Data System (ADS)

    Kuskovsky, Igor; Neumark, G. F.; Tischler, J.; Iota, V.; Weinstein, B. A.

    2000-03-01

    It is well known that to this day p-type ZnSe, even with the best acceptor dopant, nitrogen, can not be doped higher than 10^18 cm-3, even with a 100% acceptor activation ratio. The knowledge of the defect structure of highly doped and compensated ZnSe:N can help to understand this limitation. We report here the results of PL studies done under hydrostatic pressure. We have found the presence of a resonant donor defect in heavily doped and compensated ZnSe:N; this donor has a level of ~20-140 meV above the conduction band edge at ambient pressure. The red-shifted donor-acceptor-pair photoluminescence observed in these samples is quenched by the resonant defect for pressures higher than ~25 kbar. A split N-N interstitial on a Se site is discussed as a reasonable candidate for such a defect. Auger recombination is proposed as a quenching mechanism. These findings are compared with earlier results on intermediately doped ZnSe:N, and with data on compensated ZnSe:P. We suggest that, for high doping, the similar PL quenching seen above ~30kbar in ZnSe:P could be due to an analogous donor defect. Two of the authors (IK & GFN) acknowledge support from DOE grant DE-FG02-98ER45694

  4. p-Type hydrogen sensing with Al- and V-doped TiO2 nanostructures.

    PubMed

    Li, Zhaohui; Ding, Dongyan; Ning, Congqin

    2013-01-12

    Doping with other elements is one of the efficient ways to modify the physical and chemical properties of TiO2 nanomaterials. In the present work, anatase TiO2 nanofilms doped with Al and V elements were fabricated through anodic oxidation of Ti6Al4V alloy and further annealing treatment. Hydrogen sensing behavior of the crystallized Ti-Al-V-O nanofilms at various working temperatures was investigated through exposure to 1,000 ppm H2. Different from n-type hydrogen sensing characteristics of undoped TiO2 nanotubes, the Al- and V-doped nanofilms presented a p-type hydrogen sensing behavior by showing increased resistance upon exposure to the hydrogen-containing atmosphere. The Ti-Al-V-O nanofilm annealed at 450°C was mainly composed of anatase phase, which was sensitive to hydrogen-containing atmosphere only at elevated temperatures. Annealing of the Ti-Al-V-O nanofilm at 550°C could increase the content of anatase phase in the oxide nanofilm and thus resulted in a good sensitivity and resistance recovery at both room temperature and elevated temperatures. The TiO2 nanofilms doped with Al and V elements shows great potential for use as a robust semiconducting hydrogen sensor.

  5. p-Type hydrogen sensing with Al- and V-doped TiO2 nanostructures

    PubMed Central

    2013-01-01

    Doping with other elements is one of the efficient ways to modify the physical and chemical properties of TiO2 nanomaterials. In the present work, anatase TiO2 nanofilms doped with Al and V elements were fabricated through anodic oxidation of Ti6Al4V alloy and further annealing treatment. Hydrogen sensing behavior of the crystallized Ti-Al-V-O nanofilms at various working temperatures was investigated through exposure to 1,000 ppm H2. Different from n-type hydrogen sensing characteristics of undoped TiO2 nanotubes, the Al- and V-doped nanofilms presented a p-type hydrogen sensing behavior by showing increased resistance upon exposure to the hydrogen-containing atmosphere. The Ti-Al-V-O nanofilm annealed at 450°C was mainly composed of anatase phase, which was sensitive to hydrogen-containing atmosphere only at elevated temperatures. Annealing of the Ti-Al-V-O nanofilm at 550°C could increase the content of anatase phase in the oxide nanofilm and thus resulted in a good sensitivity and resistance recovery at both room temperature and elevated temperatures. The TiO2 nanofilms doped with Al and V elements shows great potential for use as a robust semiconducting hydrogen sensor. PMID:23311459

  6. p-Type hydrogen sensing with Al- and V-doped TiO2 nanostructures

    NASA Astrophysics Data System (ADS)

    Li, Zhaohui; Ding, Dongyan; Ning, Congqin

    2013-01-01

    Doping with other elements is one of the efficient ways to modify the physical and chemical properties of TiO2 nanomaterials. In the present work, anatase TiO2 nanofilms doped with Al and V elements were fabricated through anodic oxidation of Ti6Al4V alloy and further annealing treatment. Hydrogen sensing behavior of the crystallized Ti-Al-V-O nanofilms at various working temperatures was investigated through exposure to 1,000 ppm H2. Different from n-type hydrogen sensing characteristics of undoped TiO2 nanotubes, the Al- and V-doped nanofilms presented a p-type hydrogen sensing behavior by showing increased resistance upon exposure to the hydrogen-containing atmosphere. The Ti-Al-V-O nanofilm annealed at 450°C was mainly composed of anatase phase, which was sensitive to hydrogen-containing atmosphere only at elevated temperatures. Annealing of the Ti-Al-V-O nanofilm at 550°C could increase the content of anatase phase in the oxide nanofilm and thus resulted in a good sensitivity and resistance recovery at both room temperature and elevated temperatures. The TiO2 nanofilms doped with Al and V elements shows great potential for use as a robust semiconducting hydrogen sensor.

  7. High-throughput search of ternary chalcogenides for p-type transparent electrodes

    NASA Astrophysics Data System (ADS)

    Shi, Jingming; Cerqueira, Tiago F. T.; Cui, Wenwen; Nogueira, Fernando; Botti, Silvana; Marques, Miguel A. L.

    2017-03-01

    Delafossite crystals are fascinating ternary oxides that have demonstrated transparent conductivity and ambipolar doping. Here we use a high-throughput approach based on density functional theory to find delafossite and related layered phases of composition ABX2, where A and B are elements of the periodic table, and X is a chalcogen (O, S, Se, and Te). From the 15 624 compounds studied in the trigonal delafossite prototype structure, 285 are within 50 meV/atom from the convex hull of stability. These compounds are further investigated using global structural prediction methods to obtain their lowest-energy crystal structure. We find 79 systems not present in the materials project database that are thermodynamically stable and crystallize in the delafossite or in closely related structures. These novel phases are then characterized by calculating their band gaps and hole effective masses. This characterization unveils a large diversity of properties, ranging from normal metals, magnetic metals, and some candidate compounds for p-type transparent electrodes.

  8. Improved source design for p-type tunnel field-effect transistors: Towards truly complementary logic

    SciTech Connect

    Verreck, Devin Groeseneken, Guido; Verhulst, Anne S.; Collaert, Nadine; Mocuta, Anda; Thean, Aaron; Sorée, Bart

    2014-12-15

    Complementary logic based on tunnel field-effect transistors (TFETs) would drastically reduce power consumption thanks to the TFET's potential to obtain a sub-60 mV/dec subthreshold swing (SS). However, p-type TFETs typically do not meet the performance of n-TFETs for direct bandgap III-V configurations. The p-TFET SS stays well above 60 mV/dec, due to the low density of states in the conduction band. We therefore propose a source configuration in which a highly doped region is maintained only near the tunnel junction. In the remaining part of the source, the hot carriers in the exponential tail of the Fermi-Dirac distribution are blocked by reducing the doping degeneracy, either with a source section with a lower doping concentration or with a heterostructure. We apply this concept to n-p-i-p configurations consisting of In{sub 0.53}Ga{sub 0.47}As and an InP-InAs heterostructure. 15-band quantum mechanical simulations predict that the configurations with our source design can obtain sub-60 mV/dec SS, with an on-current comparable to the conventional source design.

  9. SIM Lite Detection of Habitable Planets in P-Type Binary-Planetary Systems

    NASA Technical Reports Server (NTRS)

    Pan, Xiaopei; Shao, Michael; Shaklan, Stuart; Goullioud, Renaud

    2010-01-01

    Close binary stars like spectroscopic binaries create a completely different environment than single stars for the evolution of a protoplanetary disk. Dynamical interactions between one star and protoplanets in such systems provide more challenges for theorists to model giant planet migration and formation of multiple planets. For habitable planets the majority of host stars are in binary star systems. So far only a small amount of Jupiter-size planets have been discovered in binary stars, whose minimum separations are 20 AU and the median value is about 1000 AU (because of difficulties in radial velocity measurements). The SIM Lite mission, a space-based astrometric observatory, has a unique capability to detect habitable planets in binary star systems. This work analyzed responses of the optical system to the field stop for companion stars and demonstrated that SIM Lite can observe exoplanets in visual binaries with small angular separations. In particular we investigated the issues for the search for terrestrial planets in P-type binary-planetary systems, where the planets move around both stars in a relatively distant orbit.

  10. Silicon Detectors

    NASA Astrophysics Data System (ADS)

    Sadrozinski, Hartmut

    2014-03-01

    The use of silicon detectors has experienced an exponential growth in accelerator and space based experiments, similar to trends in the semiconductor industry as a whole, usually paraphrased as ``Moore's Law.'' Some of the essentials for this phenomenon will be presented, together with examples of the exciting science results which it enabled. With the establishment of a ``semiconductor culture'' in universities and laboratories around the world, an increased understanding of the sensors results in thinner, faster, more radiation-resistant detectors, spawning an amazing wealth of new technologies and applications, which will be the main subject of the presentation.

  11. Distribution of iron in multicrystalline silicon ingots

    NASA Astrophysics Data System (ADS)

    Kvande, R.; Geerligs, L. J.; Coletti, G.; Arnberg, L.; Di Sabatino, M.; Øvrelid, E. J.; Swanson, C. C.

    2008-09-01

    The distribution of iron in multicrystalline silicon ingots for solar cells has been studied. A p- and a n-type multicrystalline ingot were intentionally contaminated by adding 53ppmwt (μg/g) of iron to the silicon feedstock and compared to a reference p-type ingot produced from ultrapure silicon feedstock. The vertical total iron distribution was determined by neutron activation analysis and glow discharge mass spectrometry. For the intentionally Fe-contaminated ingots, the distribution can be described by Scheil's equation with an effective distribution coefficient of 2×10-5. The interstitial iron concentration was measured in the p-type ingots. In the Fe-contaminated ingot, it is almost constant throughout the ingot and constitutes about 50% of the total concentration, which is in conflict with the previous studies. Gettering had a large impact on the interstitial iron levels by reducing the concentration by two orders of magnitude. Considerable trapping was observed at crystal defects on as-cut wafers from the same ingot. The trapping was suppressed by gettering. The back diffusion of iron from the ingot top after complete solidification was modeled and found to affect the iron concentration up to a distance of approximately 17mm into the ingot. The interstitial as well as the total iron concentration of the reference ingot were extremely low and difficult to measure accurately.

  12. Silicon concentrator solar cell research

    SciTech Connect

    Green, M.A.; Zhao, J.; Wang, A.; Dai, X.; Milne, A.; Cai, S.; Aberle, A.; Wenham, S.R.

    1993-06-01

    This report describes work conducted between December 1990 and May 1992 continuing research on silicon concentrator solar cells. The objectives of the work were to improve the performance of high-efficiency cells upon p-type substrates, to investigate the ultraviolet stability of such cells, to develop concentrator cells based on n-type substrates, and to transfer technology to appropriate commercial environments. Key results include the identification of contact resistance between boron-defused areas and rear aluminum as the source of anomalously large series resistance in both p- and n-type cells. A major achievement of the present project was the successful transfer of cell technology to both Applied Solar Energy Corporation and Solarex Corporation.

  13. A case of mimicking angioedema: chin silicone granulomatous reaction spreading all over the face after receiving liquid silicone injection forty years previously.

    PubMed

    Chen, Yu-Cheng; Chen, Mei-Ling; Chiu, Ying-Ming

    2011-06-01

    Liquid injectable silicone has been used for soft tissue augmentation for five decades. Many complications following liquid silicone injection have been reported. To diagnose and manage silicone granuloma remains difficult. Silicone granuloma must be diagnosed with the history of liquid silicone injection and the histology of tissue biopsy. We presented a case of granulomatous reaction after the injection of liquid silicone for chin augmentation forty years ago, causing total facial swelling, which mimicking angioedema initially. We administered methylprednisolone to the patient. Initial response to methylprednisolone was favorable.

  14. Silicones: use of substantive properties on skin and hair.

    PubMed

    Disapio, A; Fridd, P

    1988-04-01

    Summary Silicones have been incorporated in personal care products since the 1950s. Initially used in skin care products, and more recently in hair care applications, silicones are recognized for their lubricating properties and for the characteristic soft smooth feel they impart. With recent advances in silicone technology, these fluids can also provide substantivity and durability. Resinous silicones such as trimethylsiloxysilicate act as effective substantivity additives when combined with dimethyl silicone in skin care formulations. In tests evaluating the number of wash cycles required to penetrate a silicone barrier, resistance to removal increases markedly as the proportion of resinous silicone to dimethyl silicone is increased. This improvement is related directly to decreased solubility of the resin.

  15. Discovering a Defect that Imposes a Limit to Mg Doping in p-TypeGaN

    SciTech Connect

    Liliental-Weber, Z.; Tomaszewicz, T.; Zakharov, D.; O'Keefe, M.A.

    2006-07-20

    Gallium nitride (GaN) is the III-V semiconductor used to produce blue light-emitting diodes (LEDs) and blue and ultraviolet solid-state lasers. To be useful in electronic devices, GaN must be doped with elements that function either as electron donors or as acceptors to turn it into either an n-type semiconductor or a p-type semiconductor. It has been found that GaN can easily be grown with n-conductivity, even up to large concentrations of donors--in the few 10{sup 19}cm{sup -3} range. However, p-doping, the doping of the structure with atoms that provide electron sinks or holes, is not well understood and remains extremely difficult. The only efficient p-type dopant is Mg, but it is found that the free hole concentration is limited to 2 x 10{sup 18}cm{sup -3}, even when Mg concentrations are pushed into the low 10{sup 19}cm{sup -3} range. This saturation effect could place a limit on further development of GaN based devices. Further increase of the Mg concentration, up to 1 x 10{sup 20}cm{sup -3} leads to a decrease of the free hole concentration and an increase in defects. While low- to medium-brightness GaN light-emitting diodes (LEDs) are remarkably tolerant of crystal defects, blue and UV GaN lasers are much less so. We used electron microscopy to investigate Mg doping in GaN. Our transmission electron microscopy (TEM) studies revealed the formation of different types of Mg-rich defects [1,2]. In particular, high-resolution TEM allowed us to characterize a completely new type of defect in Mg-rich GaN. We found that the type of defect depended strongly on crystal growth polarity. For crystals grown with N-polarity, planar defects are distributed at equal distances (20 unit cells of GaN); these defects can be described as inversion domains [1]. For growth with Ga-polarity, we found a different type of defect [2]. These defects turn out to be three-dimensional Mg-rich hexagonal pyramids (or trapezoids) with their base on the (0001) plane and their six walls

  16. Realization of Cu-Doped p-Type ZnO Thin Films by Molecular Beam Epitaxy.

    PubMed

    Suja, Mohammad; Bashar, Sunayna B; Morshed, Muhammad M; Liu, Jianlin

    2015-04-29

    Cu-doped p-type ZnO films are grown on c-sapphire substrates by plasma-assisted molecular beam epitaxy. Photoluminescence (PL) experiments reveal a shallow acceptor state at 0.15 eV above the valence band edge. Hall effect results indicate that a growth condition window is found for the formation of p-type ZnO thin films, and the best conductivity is achieved with a high hole concentration of 1.54 × 10(18) cm(-3), a low resistivity of 0.6 Ω cm, and a moderate mobility of 6.65 cm(2) V(-1) s(-1) at room temperature. Metal oxide semiconductor capacitor devices have been fabricated on the Cu-doped ZnO films, and the characteristics of capacitance-voltage measurements demonstrate that the Cu-doped ZnO thin films under proper growth conditions are p-type. Seebeck measurements on these Cu-doped ZnO samples lead to positive Seebeck coefficients and further confirm the p-type conductivity. Other measurements such as X-ray diffraction, X-ray photoelectron, Raman, and absorption spectroscopies are also performed to elucidate the structural and optical characteristics of the Cu-doped p-type ZnO films. The p-type conductivity is explained to originate from Cu substitution of Zn with a valency of +1 state. However, all p-type samples are converted to n-type over time, which is mostly due to the carrier compensation from extrinsic defects of ZnO.

  17. PAA1, a P-Type ATPase of Arabidopsis, Functions in Copper Transport in Chloroplasts

    PubMed Central

    Shikanai, Toshiharu; Müller-Moulé, Patricia; Munekage, Yuri; Niyogi, Krishna K.; Pilon, Marinus

    2003-01-01

    Copper (Cu) is an essential trace element with important roles as a cofactor in many plant functions, including photosynthesis. However, free Cu ions can cause toxicity, necessitating precise Cu delivery systems. Relatively little is known about Cu transport in plant cells, and no components of the Cu transport machinery in chloroplasts have been identified previously. Cu transport into chloroplasts provides the cofactor for the stromal enzyme copper/zinc superoxide dismutase (Cu/ZnSOD) and for the thylakoid lumen protein plastocyanin, which functions in photosynthetic electron transport from the cytochrome b6f complex to photosystem I. Here, we characterized six Arabidopsis mutants that are defective in the PAA1 gene, which encodes a member of the metal-transporting P-type ATPase family with a functional N-terminal chloroplast transit peptide. paa1 mutants exhibited a high-chlorophyll-fluorescence phenotype as a result of an impairment of photosynthetic electron transport that could be ascribed to decreased levels of holoplastocyanin. The paa1-1 mutant had a lower chloroplast Cu content, despite having wild-type levels in leaves. The electron transport defect of paa1 mutants was evident on medium containing <1 μM Cu, but it was suppressed by the addition of 10 μM Cu. Chloroplastic Cu/ZnSOD activity also was reduced in paa1 mutants, suggesting that PAA1 mediates Cu transfer across the plastid envelope. Thus, PAA1 is a critical component of a Cu transport system in chloroplasts responsible for cofactor delivery to plastocyanin and Cu/ZnSOD. PMID:12782727

  18. Host and Pathogen Copper-Transporting P-Type ATPases Function Antagonistically during Salmonella Infection.

    PubMed

    Ladomersky, Erik; Khan, Aslam; Shanbhag, Vinit; Cavet, Jennifer S; Chan, Jefferson; Weisman, Gary A; Petris, Michael J

    2017-09-01

    Copper is an essential yet potentially toxic trace element that is required by all aerobic organisms. A key regulator of copper homeostasis in mammalian cells is the copper-transporting P-type ATPase ATP7A, which mediates copper transport from the cytoplasm into the secretory pathway, as well as copper export across the plasma membrane. Previous studies have shown that ATP7A-dependent copper transport is required for killing phagocytosed Escherichia coli in a cultured macrophage cell line. In this investigation, we expanded on these studies by generating Atp7a(LysMcre) mice, in which the Atp7a gene was specifically deleted in cells of the myeloid lineage, including macrophages. Primary macrophages isolated from Atp7a(LysMcre) mice exhibit decreased copper transport into phagosomal compartments and a reduced ability to kill Salmonella enterica serovar Typhimurium compared to that of macrophages isolated from wild-type mice. The Atp7a(LysMcre) mice were also more susceptible to systemic infection by S Typhimurium than wild-type mice. Deletion of the S Typhimurium copper exporters, CopA and GolT, was found to decrease infection in wild-type mice but not in the Atp7a(LysMcre) mice. These studies suggest that ATP7A-dependent copper transport into the phagosome mediates host defense against S Typhimurium, which is counteracted by copper export from the bacteria via CopA and GolT. These findings reveal unique and opposing functions for copper transporters of the host and pathogen during infection. Copyright © 2017 American Society for Microbiology.

  19. Inkjet Printing NiO-Based p-Type Dye-Sensitized Solar Cells.

    PubMed

    Brisse, R; Faddoul, R; Bourgeteau, T; Tondelier, D; Leroy, J; Campidelli, S; Berthelot, T; Geffroy, B; Jousselme, B

    2017-01-25

    Fabrication at low cost of transparent p-type semiconductors with suitable electronic properties is essential toward the scalability of many electronic devices, especially for photovoltaic and photocatalytic applications. In this context, the synthesis of mesoporous NiO films through inkjet printing of a sol-gel ink was investigated for the first time. Nickel chloride and Pluronic F-127, used as nickel oxide precursor and pore-forming agent, respectively, were formulated in a water/ethanol mixture to prepare a jettable ink for Dimatix printer. Multilayer NiO films were formed, and different morphologies could be obtained by playing on the interlayer thermal treatment. At low temperature (30 °C), a porous nanoparticulate-nanofiber dual-pore structure was observed. On the other hand, with a high temperature treatment (450 °C), nanoparticulate denser films without any dual structure were obtained. The mechanism for NiO formation during the final sintering step, investigated by means of X-ray photolectron spectroscopy, shows that a Ni(OH)2 species is an intermediate between NiCl2 and NiO. The different morphologies and thicknesses of the NiO films were correlated to their performance in a p-DSSC configuration, using a new push-pull dye (so-called "RBG-174") and an iodine-based electrolyte. Moreover, the positive impact of a nanometric NiOx layer deposited by spin-coating and introduced between FTO and the NiO mesoporous network is highlighted in the present work. The best results were obtained with NiOx/four layer-NiO mesoporous photocathodes of 860 nm, with a current density at the short circuit of 3.42 mA cm(-2) (irradiance of 100 mW cm(-2) spectroscopically distributed following AM 1.5).

  20. Plasmodium P-Type Cyclin CYC3 Modulates Endomitotic Growth during Oocyst Development in Mosquitoes

    PubMed Central

    Ferguson, David J. P.; Kaindama, Mbinda L.; Brusini, Lorenzo; Joshi, Nimitray; Rchiad, Zineb; Brady, Declan; Guttery, David S.; Wheatley, Sally P.; Yamano, Hiroyuki; Holder, Anthony A.; Pain, Arnab; Wickstead, Bill; Tewari, Rita

    2015-01-01

    Cell-cycle progression and cell division in eukaryotes are governed in part by the cyclin family and their regulation of cyclin-dependent kinases (CDKs). Cyclins are very well characterised in model systems such as yeast and human cells, but surprisingly little is known about their number and role in Plasmodium, the unicellular protozoan parasite that causes malaria. Malaria parasite cell division and proliferation differs from that of many eukaryotes. During its life cycle it undergoes two types of mitosis: endomitosis in asexual stages and an extremely rapid mitotic process during male gametogenesis. Both schizogony (producing merozoites) in host liver and red blood cells, and sporogony (producing sporozoites) in the mosquito vector, are endomitotic with repeated nuclear replication, without chromosome condensation, before cell division. The role of specific cyclins during Plasmodium cell proliferation was unknown. We show here that the Plasmodium genome contains only three cyclin genes, representing an unusual repertoire of cyclin classes. Expression and reverse genetic analyses of the single Plant (P)-type cyclin, CYC3, in the rodent malaria parasite, Plasmodium berghei, revealed a cytoplasmic and nuclear location of the GFP-tagged protein throughout the lifecycle. Deletion of cyc3 resulted in defects in size, number and growth of oocysts, with abnormalities in budding and sporozoite formation. Furthermore, global transcript analysis of the cyc3-deleted and wild type parasites at gametocyte and ookinete stages identified differentially expressed genes required for signalling, invasion and oocyst development. Collectively these data suggest that cyc3 modulates oocyst endomitotic development in Plasmodium berghei. PMID:26565797