UV testing of solar cells: Effects of antireflective coating, prior irradiation, and UV source

NASA Technical Reports Server (NTRS)

Meulenberg, A.

1993-01-01

Short-circuit current degradation of electron irradiated double-layer antireflective-coated cells after 3000 hours ultraviolet (UV) exposure exceeds 3 percent; extrapolation of the data to 10(exp 5) hours (11.4 yrs.) gives a degradation that exceeds 10 percent. Significant qualitative and quantitative differences in degradation were observed in cells with double- and single-layer antireflective coatings. The effects of UV-source age were observed and corrections were made to the data. An additional degradation mechanism was identified that occurs only in previously electron-irradiated solar cells since identical unirradiated cells degrade to only 6 +/- 3 percent when extrapolated 10(exp 5) hours of UV illumination.

Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition

NASA Astrophysics Data System (ADS)

Pfeiffer, K.; Schulz, U.; Tünnermann, A.; Szeghalmi, A.

2017-02-01

Antireflective coatings are essential to improve transmittance of optical elements. Most research and development of AR coatings has been reported on a wide variety of plane optical surfaces; however, antireflection is also necessary on nonplanar optical surfaces. Physical vapor deposition (PVD), a common method for optical coatings, often results in thickness gradients on strongly curved surfaces, leading to a failure of the desired optical function. In this work, optical thin films of tantalum pentoxide, aluminum oxide and silicon dioxide were prepared by atomic layer deposition (ALD), which is based on self-limiting surface reactions. The results demonstrate that ALD optical layers can be deposited on both vertical and horizontal substrate surfaces with uniform thicknesses and the same optical properties. A Ta2O5/Al2O3/ SiO2 multilayer AR coating (400-700 nm) was successfully applied to a curved aspheric glass lens with a diameter of 50 mm and a center thickness of 25 mm.

Two-layer anti-reflection strategies for implant applications

NASA Astrophysics Data System (ADS)

Guerrero, Douglas J.; Smith, Tamara; Kato, Masakazu; Kimura, Shigeo; Enomoto, Tomoyuki

2006-03-01

A two-layer bottom anti-reflective coating (BARC) concept in which a layer that develops slowly is coated on top of a bottom layer that develops more rapidly was demonstrated. Development rate control was achieved by selection of crosslinker amount and BARC curing conditions. A single-layer BARC was compared with the two-layer BARC concept. The single-layer BARC does not clear out of 200-nm deep vias. When the slower developing single-layer BARC was coated on top of the faster developing layer, the vias were cleared. Lithographic evaluation of the two-layer BARC concept shows the same resolution advantages as the single-layer system. Planarization properties of a two-layer BARC system are better than for a single-layer system, when comparing the same total nominal thicknesses.

Fabrication of superhydrophilic and antireflective silica coatings on poly(methyl methacrylate) substrates

DOE Office of Scientific and Technical Information (OSTI.GOV)

Geng, Zhi; Graduate University of Chinese Academy of Sciences; He, Junhui, E-mail: jhhe@mail.ipc.ac.cn

2012-06-15

Graphical abstract: Self-cleaning and antireflection properties were successfully achieved by assembling (PDDA/S-20){sub n} coatings on PMMA substrates followed by oxygen plasma treatment. Highlights: ► Porous silica coatings were created by layer-by-layer assembly on PMMA substrates. ► Silica coatings were treated by oxygen plasma. ► Porous silica coatings were highly antireflective and superhydrophilic on PMMA substrates. -- Abstract: Silica nanoparticles of ca. 20 nm in size were synthesized, from which hierarchically porous silica coatings were fabricated on poly(methyl methacrylate) (PMMA) substrates via layer-by-layer (LbL) assembly followed by oxygen plasma treatment. These porous silica coatings were highly transparent and superhydrophilic. The maximummore » transmittance reached as high as 99%, whereas that of the PMMA substrate is only 92%. After oxygen plasma treatment, the time for a water droplet to spread to a contact angle of lower than 5° decreased to as short as 0.5 s. Scanning and transmission electron microscopy were used to observe the morphology and structure of nanoparticles and coating surfaces. Transmission and reflection spectra were recorded on UV–vis spectrophotometer. Surface wettability was studied by a contact angle/interface system. The influence of mesopores on the transmittance and wetting properties of coatings was discussed on the basis of experimental observations.« less

Development of a Multi-layer Anti-reflective Coating for Gallium Arsenide/Aluminum Gallium Arsenide Solar Cells

DTIC Science & Technology

2015-07-01

optical loss mechanism, which limits the efficiency of the PV device.1 Photon absorption needs to occur inside the solar cell active region (near the...Aluminum Gallium Arsenide Solar Cells by Kimberley A Olver Approved for public release; distribution unlimited...Development of a Multi-layer Anti-reflective Coating for Gallium Arsenide/Aluminum Gallium Arsenide Solar Cells by Kimberley A Olver

Optical Coatings With Graded Index Layers For High Power Laser Applications: Design

NASA Astrophysics Data System (ADS)

Zukic, Muamer; Guenther, Karl H.

1988-06-01

Graded index layers provide a greater flexibility for the design of optical coatings than "homogeneous" layers. A graded index layer can replace the whole or a part of a traditional multilayer stack of alternating thin films of high and low refractive index. This paper presents design examples for broadband antireflection coatings, narrowband high reflectors (also referred to as minus filters or rejection line filters), and non-polarizing beam splitters. Optimized refractive index profiles are derived for broadband antireflection coatings for various combinations of incident medium and substrate. The rejection line filter example uses a sinusoidal (rugate) index profile. The non-polarizing beamsplitter summarizes the topical contents of a paper presented in another conference at the same symposium.

Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A Mini-Review

PubMed Central

Keshavarz Hedayati, Mehdi; Elbahri, Mady

2016-01-01

Reduction of unwanted light reflection from a surface of a substance is very essential for improvement of the performance of optical and photonic devices. Antireflective coatings (ARCs) made of single or stacking layers of dielectrics, nano/microstructures or a mixture of both are the conventional design geometry for suppression of reflection. Recent progress in theoretical nanophotonics and nanofabrication has enabled more flexibility in design and fabrication of miniaturized coatings which has in turn advanced the field of ARCs considerably. In particular, the emergence of plasmonic and metasurfaces allows for the realization of broadband and angular-insensitive ARC coatings at an order of magnitude thinner than the operational wavelengths. In this review, a short overview of the development of ARCs, with particular attention paid to the state-of-the-art plasmonic- and metasurface-based antireflective surfaces, is presented. PMID:28773620

Transmissive metallic contact for amorphous silicon solar cells

DOEpatents

Madan, A.

1984-11-29

A transmissive metallic contact for amorphous silicon semiconductors includes a thin layer of metal, such as aluminum or other low work function metal, coated on the amorphous silicon with an antireflective layer coated on the metal. A transparent substrate, such as glass, is positioned on the light reflective layer. The metallic layer is preferably thin enough to transmit at least 50% of light incident thereon, yet thick enough to conduct electricity. The antireflection layer is preferably a transparent material that has a refractive index in the range of 1.8 to 2.2 and is approximately 550A to 600A thick.

Porous Silicon as Antireflecting Layer

NASA Astrophysics Data System (ADS)

Kosoglu, Gulsen; Yumak, Mehmet; Okmen, Selim; Ozatay, Ozhan; Skarlatos, Yani; Garcia, Carlos

2013-03-01

The main aim in photovoltaic industry is to produce efficient and energy competitive solar cell modules at low cost. Efficient AntiReflection Coatings (ARC) improve light collection and thereby increase the current output of solar cells. Broadband ARCs are desirable for efficient application over the entire solar spectrum and porous silicon layers as antireflective coating layers provide successful light collection. In the study the most critical physical parameters of porous silicon are examined, homogeneous and uniform porous layers are produced. The photoluminescence spectrum and optical parameters of porous layers have been investigated, and we are now in the process of improving the efficiency of the device by modulating the structure of the porous silicon layers and studying its photovoltaic characteristics. We would like to thank to Mr. Aziz U. Caliskan and his group for their valuable support from TUBITAK YITAL. This Project is supported by Bogazici University Research Funding: 5782, TUBITAK Grant : 209T099, and Bogazici University Infrared Funding: 6121.

ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

NASA Astrophysics Data System (ADS)

Liu, Hao; Jensen, Lars; Ma, Ping; Ristau, Detlev

2018-04-01

Atomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3 and HfO2 single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2 as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

Multi-layer coating of SiO2 nanoparticles to enhance light absorption by Si solar cells

NASA Astrophysics Data System (ADS)

Nam, Yoon-Ho; Um, Han-Don; Park, Kwang-Tae; Shin, Sun-Mi; Baek, Jong-Wook; Park, Min-Joon; Jung, Jin-Young; Zhou, Keya; Jee, Sang-Won; Guo, Zhongyi; Lee, Jung-Ho

2012-06-01

We found that multi-layer coating of a Si substrate with SiO2 dielectric nanoparticles (NPs) was an effective method to suppress light reflection by silicon solar cells. To suppress light reflection, two conditions are required for the coating: 1) The difference of refractive indexes between air and Si should be alleviated, and 2) the quarter-wavelength antireflection condition should be satisfied while avoiding intrinsic absorption loss. Light reflection was reduced due to destructive interference at certain wavelengths that depended on the layer thickness. For the same thickness dielectric layer, smaller NPs enhanced antireflectance more than larger NPs due to a decrease in scattering loss by the smaller NPs.

Antireflection coatings with SiOx-TiO2 multilayer structures

NASA Astrophysics Data System (ADS)

Lu, Jong-Hong; Luo, Jen-Wei; Chuang, Shiou-Ruei; Chen, Bo-Ying

2014-11-01

In this study, we used SiOx-TiO2 multilayer antireflective coatings to achieve optical average transmittances of 94.93 and 98.07% for one-sided and double-sided coatings on a glass substrate, respectively. A SiOx film was employed as the material with a low refractive index and a TiO2 film as the material with a high refractive index. Results showed that when any layer thickness of the SiOx-TiO2 nano-multilayer (NML) structure is much less than the wavelength of visible light, the SiOx-TiO2 thickness ratio can be used to adjust the optical refractive index of the entire NML film. In this study, we produced dense antireflective coatings of three layers (SiOx, TiO2, and SiOx-TiO2 NML/glass substrate) and four layers (SiOx, TiO2, SiOx, and TiO2/glass substrate) with film thicknesses and refractive indices controlled by reactive magnetron sputtering. Thermal treatment at 600 °C in an air atmosphere was also shown to reduce the absorption of visible light, resolving the issue of degraded transparency caused by increasing sputtering speed. The microhardness of the antireflective film was 8.44 GPa, similar to that of the glass substrate. Process window analysis demonstrated the feasibility of the antireflective coating process window from an engineering standpoint. The thickness of the film deviated by less than 10% from the ideal thickness, corresponding to a 98% transmittance range, and the simulation and experimental results were relatively consistent.

Fabrication of broadband antireflection coating at terahertz frequency using a hot emboss method

NASA Astrophysics Data System (ADS)

Li, YunZhou; Cai, Bin; Zhu, YiMing

2014-11-01

We fabricated a terahertz anti-reflective structure on a polystylene by using a hot-embossing method. Polystylene was spin-coated onto a silicon substrate and then transformed by using a metallic mould comprising a bunch of Chinese acupuncture needles. The transformation layer yielded gradient refractive index profiles on the substrate which can reduce the surface reflection effectively. The samples were evaluated by a terahertz time-domain spectroscope. Compared with a bare silicon substrate, we observed an increase of ~30% in the transmittance. We also observed broader bandwidth properties compared with a single-layer antireflective structure. The process imposes no substrate limiting; i.e., it has great potential to be applied onto various THz devices.

Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells.

PubMed

Rahman, Atikur; Ashraf, Ahsan; Xin, Huolin; Tong, Xiao; Sutter, Peter; Eisaman, Matthew D; Black, Charles T

2015-01-21

Materials providing broadband light antireflection have applications as highly transparent window coatings, military camouflage, and coatings for efficiently coupling light into solar cells and out of light-emitting diodes. In this work, densely packed silicon nanotextures with feature sizes smaller than 50 nm enhance the broadband antireflection compared with that predicted by their geometry alone. A significant fraction of the nanotexture volume comprises a surface layer whose optical properties differ substantially from those of the bulk, providing the key to improved performance. The nanotexture reflectivity is quantitatively well-modelled after accounting for both its profile and changes in refractive index at the surface. We employ block copolymer self-assembly for precise and tunable nanotexture design in the range of ~10-70 nm across macroscopic solar cell areas. Implementing this efficient antireflection approach in crystalline silicon solar cells significantly betters the performance gain compared with an optimized, planar antireflection coating.

Chitin Nanofibers Extracted from Crab Shells in Broadband Visible Antireflection Coatings with Controlling Layer-by-Layer Deposition and the Application for Durable Antifog Surfaces.

PubMed

Manabe, Kengo; Tanaka, Chie; Moriyama, Yukari; Tenjimbayashi, Mizuki; Nakamura, Chiaki; Tokura, Yuki; Matsubayashi, Takeshi; Kyung, Kyu-Hong; Shiratori, Seimei

2016-11-23

Reflection from various surfaces of many optical systems, such as photovoltaics and displays, is a critical issue for their performance, and antireflection coatings play a pivotal role in a wide variety of optical technologies, reducing light reflectance loss and hence maximizing light transmission. With the current movement toward optically transparent polymeric media and coatings for antireflection technology, the need for economical and environmentally friendly materials and methods without dependence on shape or size has clearly been apparent. Herein, we demonstrate novel antireflection coatings composed of chitin nanofibers (CHINFs), extracted from crab shell as a biomass material through an aqueous-based layer-by-layer self-assembly process to control the porosity. Increasing the number of air spaces inside the membrane led low refractive index, and precise control of refractive index derived from the stacking of the CHINFs achieved the highest transmittance with investigating the surface structure and the refractive index depending on the solution pH. At a wavelength of 550 nm, the transmittance of the coatings was 96.4%, which was 4.8% higher than that of a glass substrate, and their refractive index was 1.30. Further critical properties of the films were the durability and the antifogging performance derived from the mechanical stability and hydrophilicity of CHINFs, respectively. The present study may contribute to a development of systematically designed nanofibrous films which are suitable for optical applications operating at a broadband visible wavelength with durability and antifog surfaces.

Front surface passivation of silicon solar cells with antireflection coating

NASA Technical Reports Server (NTRS)

Crotty, G.; Daud, T.; Kachare, R.

1987-01-01

It is demonstrated that the deposition and postdeposition sintering of an antireflection (AR) coating in hydrogen acts to passivate silicon solar cells. Cells with and without an SiO2 passivating layer, coated with a TiO(x)/Al2O3 AR coating, showed comparable enhancements in short-wavelength spectral response and in open-circuit voltage Voc after sintering at 400 C for 5 min in a hydrogen ambient. The improvement in Voc of cells without SiO2 is attributed to front-surface passivation by the AR coating during processing.

A simple antireflection overcoat for opaque coatings in the submillimeter region

NASA Technical Reports Server (NTRS)

Smith, S. M.

1986-01-01

An antireflection overcoat for opaque baffle coatings in the far infrared (FIR)/submillimeter region was made from a simple Teflon spray-on lubricant. The Teflon overcoat reduced the specular reflectance of four different opaque coatings by nearly a factor of two. Analysis, based on the interference term of a reflecting-layer model, indicates that in the submillimeter region the reduced reflectance depends primarily on the refractive index of the overcoat and very little on its thickness.

An abrasion-resistant and broadband antireflective silica coating by block copolymer assisted sol-gel method.

PubMed

Zou, Liping; Li, Xiaoguang; Zhang, Qinghua; Shen, Jun

2014-09-02

A double-layer broadband antireflective (AR) coating was prepared on glass substrate via sol-gel process using two kinds of acid-catalyzed TEOS-derived silica sols. The relative dense layer with a porosity of ∼10% was obtained from an as-prepared sol, while the porous layer with a porosity of ∼55% was from a modified one with block copolymer (BCP) Pluronic F127 as template which results in abundant ordered mesopores. The two layers give rise to a reasonable refractive index gradient from air to the substrate and thus high transmittance in a wide wavelength range, and both of them have the same tough skeleton despite different porosity, for which each single-layer and the double-layer coatings all behaved well in the mechanical property tests. The high transmittance and the strong ability of resisting abrasion make this coating promising for applications in some harsh conditions. In addition, the preparation is simple, low-cost, time-saving, and flexible for realizing the optical property.

Specifications of ZnO growth for heterostructure solar cell and PC1D based simulations

PubMed Central

Hussain, Babar; Ebong, Abasifreke

2015-01-01

This data article is related to our recently published article (Hussain et al., in press [1]) where we have proposed a new solar cell model based on n-ZnO as front layer and p-Si as rear region. The ZnO layer will act as an active n-layer as well as antireflection (AR) coating saving considerable processing cost. There are several reports presenting use of ZnO as window/antireflection coating in solar cells (Mansoor et al., 2015; Haq et al., 2014; Hussain et al., 2014; Matsui et al., 2014; Ding et al., 2014 [2], [3], [4], [5], [6]) but, here, we provide data specifically related to simultaneous use of ZnO as n-layer and AR coating. Apart from the information we already published, we provide additional data related to growth of ZnO (with and without Ga incorporation) layers using MOCVD. The data related to PC1D based simulation of internal and external quantum efficiencies with and without antireflection effects of ZnO as well as the effects of doping level in p-Si on current–voltage characteristics have been provided. PMID:26587557

Nanostructured antistatic and antireflective thin films made of indium tin oxide and silica over-coat layer

NASA Astrophysics Data System (ADS)

Cho, Young-Sang; Hong, Jeong-Jin; Yang, Seung-Man; Choi, Chul-Jin

2010-08-01

Stable dispersion of colloidal indium tin oxide nanoparticles was prepared by using indium tin oxide nanopowder, organic solvent, and suitable dispersants through attrition process. Various comminution parameters during the attrition step were studied to optimize the process for the stable dispersion of indium tin oxide sol. The transparent and conductive films were fabricated on glass substrate using the indium tin oxide sol by spin coating process. To obtain antireflective function, partially hydrolyzed alkyl silicate was deposited as over-coat layer on the pre-fabricated indium tin oxide film by spin coating technique. This double-layered structure of the nanostructured film was characterized by measuring the surface resistance and reflectance spectrum in the visible wavelength region. The final film structure was enough to satisfy the TCO regulations for EMI shielding purposes.

Simulation and Implementation of Moth-eye Structures as a Broadband Anti-Reflective Layer

NASA Astrophysics Data System (ADS)

Deshpande, Ketan S.

Conventional single layer thin anti-reflective coatings (ARCs) are only suitable for narrowband applications. A multilayer film stack is often employed for broadband applications. A coating of multiple layers with alternating low and high refractive index materials increases the overall cost of the system. This makes multilayer ARCs unsuitable for low-cost broadband applications. Since the discovery of moth-eye corneal nipple patterns and their potential applicability in the field of broadband ARCs, many studies have been carried out to fabricate these bio-inspired nanostructures with available manufacturing processes. Plasma etching processes used in microelectronic manufacturing are applied for creating these nanostructures at the Rochester Institute of Technology's Semiconductor & Microsystems Fabrication Laboratory (SMFL). Atomic Force Microscope (AFM) scanned surfaces of the nanostructure layer are simulated and characterized for their optical properties using a Finite-Difference Time Domain (FDTD) simulator from Lumerical Solutions, Inc. known as FDTD Solutions. Simulation results show that the layer is anti-reflective over 50 to 350 nm broadband of wavelengths at 0° angle of incidence. These simulation results were supported by ellipsometer reflection measurements off the actual samples at multiple angles of light incidence, which show a 10% to 15% decrease in reflection for 240 to 400 nm wavelengths. Further improvements in the optical efficiency of these structures can be achieved through simulation-fabrication-characterization cycles performed for this project. The optimized nanostructures can then serve the purpose of low-cost anti-reflective coatings for solar cells and similar applications.

Self-Assembled Double-Quarter Antireflective Coatings using Silica and Titania Nanoparticles

NASA Astrophysics Data System (ADS)

Lal, Anitesh; Castedo Velasco, Raisa; Mazilu, Dan

2011-03-01

Antireflective coatings have a wide range of applications, from eyeglass and camera lenses, to solar panels and optoelectronic devices, to name just a few. Our study examines several factors that affect the quality of antireflective coatings created by the self-assembly of alternating layers of SiO2 and/or TiO2 nanoparticles and poly(diallyldimethylammonium chloride) polycation on glass substrates. We use a factorial design to investigate the effects of the molarity of the nanoparticle solution, the size of the nanoparticles, the pH of the nanoparticle and polycation solutions, and the number of nanoparticle-polycation bilayers on the optical properties of the films. The first order effects of these factors, as well as their interactions, on the reflectance, transmittance, and uniformity of the coatings are reported.

Dual functional porous anti-reflective coatings with a photocatalytic effect based on a single layer system

NASA Astrophysics Data System (ADS)

Jilavi, M. H.; Mousavi, S. H.; Müller, T. S.; de Oliveira, P. W.

2018-05-01

Anti-reflection and photocatalytic properties are desirable for improving the optical properties of electronic devices. We describe a method of fabrication a single-layer, anti-reflective (AR) thin film with an additional photocatalytic property. The layer is deposited on glass substrates by means of a low-cost dip-coating method using a SiO2-TiO2 solution. A comparative study was undertaken to investigate the effects of TiO2 concentrations on the photocatalytic properties of the film and to determine the optimal balance between transmittance and photocatalysis. The average transmittance increases from T = 90.51% to T = 95.46 ± 0.07% for the wavelengths between 380 and 1200 nm. The structural characterization indicated the formation of thin, porous SiO2-TiO2 films with a roughness of less than 7.5 nm. The quality of the samples was evaluated by a complete test program of the mechanical, chemical and accelerated weathering stability. This results open up new possibilities for cost-effective AR coatings for the glass and solar cell industries.

Sol-gel-Derived nano-sized double layer anti-reflection coatings (SiO2/TiO2) for low-cost solar cell fabrication.

PubMed

Lee, Seung Jun; Hur, Man Gyu; Yoon, Dae Ho

2013-11-01

We investigate nano-sized double layer anti-reflection coatings (ARCs) using a TiO2 and SiO2 sol-gel solution process for mono-crystalline silicon solar cells. The process can be easily adapted for spraying sol-gel coatings to reduce manufacturing cost. The spray-coated SiO2/TiO2 nano-sized double layer ARCs were deposited on mono-crystalline silicon solar cells, and they showed good optical properties. The spray coating process is a lower-cost fabrication process for large-scale coating than vacuum deposition processes such as PECVD. The measured average optical reflectance (300-1200 nm) was about approximately 8% for SiO2/TiO2 nano-sized double layer ARCs. The electrical parameters of a mono-crystalline silicon solar cell and reflection losses show that the SiO2/TiO2 stacks can improve cell efficiency by 0.2% compared to a non-coated mono-crystalline silicon solar cell. In the results, good correlation between theoretical and experimental data was obtained. We expect that the sol-gel spray-coated mono-crystalline silicon solar cells have high potential for low-cost solar cell fabrication.

Plasmonic and silicon spherical nanoparticle antireflective coatings

NASA Astrophysics Data System (ADS)

Baryshnikova, K. V.; Petrov, M. I.; Babicheva, V. E.; Belov, P. A.

2016-03-01

Over the last decade, plasmonic antireflecting nanostructures have been extensively studied to be utilized in various optical and optoelectronic systems such as lenses, solar cells, photodetectors, and others. The growing interest to all-dielectric photonics as an alternative optical technology along with plasmonics motivates us to compare antireflective properties of plasmonic and all-dielectric nanoparticle coatings based on silver and crystalline silicon respectively. Our simulation results for spherical nanoparticles array on top of amorphous silicon show that both silicon and silver coatings demonstrate strong antireflective properties in the visible spectral range. For the first time, we show that zero reflectance from the structure with silicon coatings originates from the destructive interference of electric- and magnetic-dipole responses of nanoparticle array with the wave reflected from the substrate, and we refer to this reflection suppression as substrate-mediated Kerker effect. We theoretically compare the silicon and silver coating effectiveness for the thin-film photovoltaic applications. Silver nanoparticles can be more efficient, enabling up to 30% increase of the overall absorbance in semiconductor layer. Nevertheless, silicon coatings allow up to 64% absorbance increase in the narrow band spectral range because of the substrate-mediated Kerker effect, and band position can be effectively tuned by varying the nanoparticles sizes.

Plasmonic and silicon spherical nanoparticle antireflective coatings

PubMed Central

Baryshnikova, K. V.; Petrov, M. I.; Babicheva, V. E.; Belov, P. A.

2016-01-01

Over the last decade, plasmonic antireflecting nanostructures have been extensively studied to be utilized in various optical and optoelectronic systems such as lenses, solar cells, photodetectors, and others. The growing interest to all-dielectric photonics as an alternative optical technology along with plasmonics motivates us to compare antireflective properties of plasmonic and all-dielectric nanoparticle coatings based on silver and crystalline silicon respectively. Our simulation results for spherical nanoparticles array on top of amorphous silicon show that both silicon and silver coatings demonstrate strong antireflective properties in the visible spectral range. For the first time, we show that zero reflectance from the structure with silicon coatings originates from the destructive interference of electric- and magnetic-dipole responses of nanoparticle array with the wave reflected from the substrate, and we refer to this reflection suppression as substrate-mediated Kerker effect. We theoretically compare the silicon and silver coating effectiveness for the thin-film photovoltaic applications. Silver nanoparticles can be more efficient, enabling up to 30% increase of the overall absorbance in semiconductor layer. Nevertheless, silicon coatings allow up to 64% absorbance increase in the narrow band spectral range because of the substrate-mediated Kerker effect, and band position can be effectively tuned by varying the nanoparticles sizes. PMID:26926602

Design and development of multilayer wideband antireflection coating and its annealing study

NASA Astrophysics Data System (ADS)

Jena, S.; Tokas, R. B.; Udupa, D. V.; Thakur, S.; Sahoo, N. K.

2018-04-01

Reflection loss occurs at the glass-air interface, limits performance of many optical devices such as eyeglass, camera lenses, and photovoltaic solar cells. Antireflection (AR) coating on the glass reduces the reflection loss and improves efficiency of such devices. In this paper, wideband AR coating in the visible region has been designed and developed using ZrO2-MgO/SiO2 multilayer. The thicknesses of individual thin layers are numerically optimized to get maximum transmission of the visible light. The optimized four thin layers have been deposited on BK7 glass substrate using electron beam evaporation technique. The measured transmission spectrum of the 4-layer AR coating is compared with that of simulated spectrum. The transmission of the single side AR coating increases by more than 3% as compared to that of bare glass substrate in the wavelength region of 470 nm - 810 nm. The wideband AR coating has been annealed at 200°C for 4 hours in ambient condition. The transmission of the AR coating decreases after the annealing, resulting degradation in its wideband AR characteristics.

Metasurface optical antireflection coating

DOE PAGES

Zhang, Boyang; Hendrickson, Joshua; Nader, Nima; ...

2014-12-15

Light reflection at the boundary of two different media is one of the fundamental phenomena in optics, and reduction of reflection is highly desirable in many optical systems. Traditionally, optical antireflection has been accomplished using single- or multiple-layer dielectric films and graded index surface structures in various wavelength ranges. However, these approaches either impose strict requirements on the refractive index matching and film thickness, or involve complicated fabrication processes and non-planar surfaces that are challenging for device integration. Here, we demonstrate an antireflection coating strategy, both experimentally and numerically, by using metasurfaces with designer optical properties in the mid-wave infrared.more » Our results show that the metasurface antireflection is capable of eliminating reflection and enhancing transmission over a broad spectral band and a wide incidence angle range. In conclusion, the demonstrated antireflection technique has no requirement on the choice of materials and is scalable to other wavelengths.« less

Multilayer solar cell waveguide structures containing metamaterials

NASA Astrophysics Data System (ADS)

Hamouche, Houria.; Shabat, Mohammed. M.; Schaadt, Daniel M.

2017-01-01

Multilayer antireflection coating structures made from silicon and metamaterials are designed and investigated using the Transfer Matrix Method (TMM). The Transfer Matrix Method is a very useful algorithm for the analysis of periodic structures. We investigate in this paper two anti-reflection coating structures for silicon solar cells with a metamaterial film layer. In the first structure, the metamaterial film layer is sandwiched between a semi-infinite glass cover layer and a semi-infinite silicon substrate layer. The second structure consists of a four layers, a pair of metamaterial-dielectric layer with opposite real part of refractive indices, is placed between the two semi-infinite cover and substrate. We have simulated the absorptivity property of the structures for adjustable thicknesses by using MAPLE software. The absorptivity of the structures achieves greater than 80% for incident electromagnetic wave of transverse magnetic (TM) polarization.

Development of a new low cost antireflective coating technique for solar cells

NASA Technical Reports Server (NTRS)

Wohlgemuth, J. H.; Warfield, D. B.; Johnson, G. A.

1982-01-01

The goal of this study was the development of an antireflective (AR) coating technique that has the potential for high throughput and low cost yet is capable of producing films of good optical quality. Previous efforts to develop sprayed AR coatings had utilized titanium isopropoxide mixed with volatile solvents. These films worked well on smooth surfaces but when applied to etched semi-crystalline silicon surfaces yielded inconsistent results with more than 20 percent of the AM1 incident light being reflected. In this program titanium isopropoxide was sprayed directly onto heater wafers (410 C) to produce a uniform AR coating even on highly textured surfaces. Tests on various types of solar cells yielded performance improvements for the hot sprayed AR cells that are equivalent to that observed for evaporated TiOx AR coated cells. As an extension of this effort a new double layer AR consisting of a bottom layer of hot sprayed titanium isopropoxide and a top layer of hot sprayed aluminum isopropoxide in methylene chloride has resulted in more than 10 percent improvement in cell output as compared to a single layer AR cell.

Optical phenomena and antifrosting property on biomimetics slippery fluid-infused antireflective films via layer-by-layer comparison with superhydrophobic and antireflective films.

PubMed

Manabe, Kengo; Nishizawa, Shingo; Kyung, Kyu-Hong; Shiratori, Seimei

2014-08-27

Sophisticated material interfaces generated by natural life forms such as lotus leaves and Nepenthes pitcher plants have exceptional abilities to resolve challenges in wide areas of industry and medicine. The nano- and microstructures inspired by these natural materials can repel various liquids and form self-cleaning coatings. In particular, slippery liquid-infused surfaces are receiving remarkable interest as transparent, nonfouling, and antifrosting synthetic surfaces for solar cells and optical devices. Here we focus on the transparency of lubricant-infused texture on antireflective films fabricated by layer-by-layer self-assembly that decrease light scattering, which is important to maintain device properties. A slippery fluid-infused antireflective film composed of chitin nanofibers less than 50 nm in diameter prevented light scattering at the long-wavelength side by Rayleigh scattering to achieve 97.2% transmittance. Moreover, films composed of the same materials demonstrated three different morphologies: superhydrophilicity with antireflection, superhydrophobicity, and omniphobicity, mimicking the biological structures of moth eyes, lotus leaves, and pitcher plants, respectively. The effect of thermal changes on the ability of each film to prevent frost formation was investigated. The slippery fluid-infused antireflective film showed effective antifrosting behavior.

GaAs shallow-homojunction solar cells

NASA Technical Reports Server (NTRS)

Fan, J. C. C.

1981-01-01

The feasibility of fabricating space resistant, high efficiency, light weight, low cost GaAs shallow homojunction solar cells for space application is investigated. The material preparation of ultrathin GaAs single crystal layers, and the fabrication of efficient GaAs solar cells on bulk GaAs substrates are discussed. Considerable progress was made in both areas, and conversion efficiency about 16% AMO was obtained using anodic oxide as a single layer antireflection coating. A computer design shows that even better cells can be obtained with double layer antireflection coating. Ultrathin, high efficiency solar cells were obtained from GaAs films prepared by the CLEFT process, with conversion efficiency as high as 17% at AMI from a 10 micrometers thick GaAs film. A organometallic CVD was designed and constructed.

Optimization of contaminated oxide inversion layer solar cell. [considering silicon oxide coating

NASA Technical Reports Server (NTRS)

Call, R. L.

1976-01-01

Contaminated oxide cells have been fabricated with efficiencies of 8.6% with values of I sub sc = 120 ma, V sub oc = .54 volts, and curve factor of .73. Attempts to optimize the fabrication step to yield a higher output have not been successful. The fundamental limitation is the inadequate antireflection coating afforded by the silicon dioxide coating used to hold the contaminating ions. Coatings of SiO, therefore, were used to obtain a good antireflection coating, but the thinness of the coatings prevented a large concentration of the contaminating ions, and the cells was weak. Data of the best cell were .52 volts V sub oc, 110 ma I sub sc, .66 CFF and 6.7% efficiency.

Fabrication and performance of polymer-nanocomposite anti-reflective thin films deposited by RIR-MAPLE

DOE Office of Scientific and Technical Information (OSTI.GOV)

Singaravelu, S.; Mayo, D. C.; Park, H-. K.

2014-07-01

Design of polymer anti-reflective (AR) optical coatings for plastic substrates is challenging because polymers exhibit a relatively narrow range of refractive indices. Here, we report synthesis of a four-layer AR stack using hybrid polymer: nanoparticle materials deposited by resonant infrared matrix-assisted pulsed laser evaporation. An Er: YAG laser ablated frozen solutions of a high-index composite containing TiO2 nanoparticles and poly(methylmethacrylate) (PMMA), alternating with a layer of PMMA. The optimized AR coatings, with thicknesses calculated using commercial software, yielded a coating for polycarbonate with transmission over 97 %, scattering <3 %, and a reflection coefficient below 0.5 % across the visiblemore » range, with a much smaller number of layers than would be predicted by a standard thin film calculation. The TiO2 nanoparticles contribute more to the enhanced refractive index of the high-index layers than can be accounted for by an effective medium model of the nanocomposite.« less

Multilayer coating of optical substrates by ion beam sputtering

NASA Astrophysics Data System (ADS)

Daniel, M. V.; Demmler, M.

2017-10-01

Ion beam sputtering is well established in research and industry, despite its relatively low deposition rates compared to electron beam evaporation. Typical applications are coatings of precision optics, like filters, mirrors and beam splitter. Anti-reflective or high-reflective multilayer stacks benefit from the high mobility of the sputtered particles on the substrate surface and the good mechanical characteristics of the layers. This work gives the basic route from single layer optimization of reactive ion beam sputtered Ta2O5 and SiO2 thin films towards complex multilayer stacks for high-reflective mirrors and anti-reflective coatings. Therefore films were deposited using different oxygen flow into the deposition chamber Afterwards, mechanical (density, stress, surface morphology, crystalline phases) and optical properties (reflectivity, absorption and refractive index) were characterized. These knowledge was used to deposit a multilayer coating for a high reflective mirror.

Application of porous silicon in solar cell

NASA Astrophysics Data System (ADS)

Maniya, Nalin H.; Ashokan, Jibinlal; Srivastava, Divesh N.

2018-05-01

Silicon is widely used in solar cell applications with over 95% of all solar cells produced worldwide composed of silicon. Nanostructured thin porous silicon (PSi) layer acting as anti-reflecting coating is used in photovoltaic solar cells due to its advantages including simple and low cost fabrication, highly textured surfaces enabling lowering of reflectance, controllability of thickness and porosity of layer, and high surface area. PSi layers have previously been reported to reduce the reflection of light and replaced the conventional anti-reflective coating layers on solar cells. This can essentially improve the efficiency and decrease the cost of silicon solar cells. Here, we investigate the reflectance of different PSi layers formed by varying current density and etching time. PSi layers were formed by a combination of current density including 60 and 80 mA/cm2 and time for fabrication as 2, 4, 6, and 8 seconds. The fabricated PSi layers were characterized using reflectance spectroscopy and field emission scanning electron microscopy. Thickness and pore size of PSi layer were increased with increase in etching time and current density, respectively. The reflectance of PSi layers was decreased with increase in etching time until 6 seconds and increased again after 6 seconds, which was observed across both the current density. Reduction in reflectance indicates the increase of absorption of light by silicon due to the thin PSi layer. In comparison with the reflectance of silicon wafer, PSi layer fabricated at 80 mA/cm2 for 6 seconds gave the best result with reduction in reflectance up to 57%. Thus, the application of PSi layer as an effective anti-reflecting coating for the fabrication of solar cell has been demonstrated.

A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kapon, Omree; Muallem, Merav; Palatnik, Alex

Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyd's Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam,more » we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser, and can be etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.« less

Synthesis of antireflective silica coatings through the synergy of polypeptide layer-by-layer assemblies and biomineralization

NASA Astrophysics Data System (ADS)

Lee, Yung-Lun; Lin, Ting-Xuan; Hsu, Feng-Ming; Jan, Jeng-Shiung

2016-01-01

We report a versatile approach to synthesize silica coatings with antireflective (AR) characteristics through the combination of a layer-by-layer (LbL) assembly technique and biomineralization. LbL assembled decanoyl-modified poly(l-lysine)/poly(l-glutamic acid) (PLL-g-Dec/PLGA) multilayer films were used as templates for silica mineralization, followed by calcination. The specific deposition of silica onto the LbL polypeptide assemblies through amine-catalyzed polycondensation resulted in silica coatings that exhibited the transcription of the nano-/microstructured polypeptide films and their film thickness and porosity can be tuned by varying the number of bilayers, degree of substitution, and PLL molecular weight. AR silica coatings exhibiting more than 6% increase in transmittance in the near UV/visible spectral range can be obtained at an optimized refractive index, thickness, and surface roughness. The abrasion test showed that the silica coatings exhibited sufficient structural durability due to continuous silica nanostructures and low surface roughness. This study demonstrated that nanostructured thin films can be synthesized for AR coatings using the synergy between the LbL assembly technique and biomineralization.We report a versatile approach to synthesize silica coatings with antireflective (AR) characteristics through the combination of a layer-by-layer (LbL) assembly technique and biomineralization. LbL assembled decanoyl-modified poly(l-lysine)/poly(l-glutamic acid) (PLL-g-Dec/PLGA) multilayer films were used as templates for silica mineralization, followed by calcination. The specific deposition of silica onto the LbL polypeptide assemblies through amine-catalyzed polycondensation resulted in silica coatings that exhibited the transcription of the nano-/microstructured polypeptide films and their film thickness and porosity can be tuned by varying the number of bilayers, degree of substitution, and PLL molecular weight. AR silica coatings exhibiting more than 6% increase in transmittance in the near UV/visible spectral range can be obtained at an optimized refractive index, thickness, and surface roughness. The abrasion test showed that the silica coatings exhibited sufficient structural durability due to continuous silica nanostructures and low surface roughness. This study demonstrated that nanostructured thin films can be synthesized for AR coatings using the synergy between the LbL assembly technique and biomineralization. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr06948c

Link between mechanical strength and laser damage threshold for antireflective coating made by sol-gel

NASA Astrophysics Data System (ADS)

Avice, J.; Piombini, H.; Boscher, C.; Belleville, P.; Vaudel, G.; Brotons, G.; Ruello, P.; Gusev, V.

2017-11-01

The MegaJoule Laser (LMJ) for inertial confinement fusion experiments is currently in operation at CEA-CESTA in France. All the lenses are coated by an antireflective (AR) layer to optimize the light power transmission. This AR layer is manufactured by sol-gel process, a soft chemical process, associated with a liquid phase coating technique to realize thin film of metal oxide. These optical components are hardened into ammoniac vapors in order to mechanically reinforce the AR coating and to make them more handling. This hardening induces a thickness reduction of the layer so an increase of the stiffness and sometimes a crazing of the layer. As these optical components undergo a high-power laser beam, so, it is important to verify if the AR properties (optical and mechanical) influence the value of the threshold laser damage. A series of coated samples have been manufactured having variable elastic moduli to discuss this point. In that purpose, a homemade Laser Induced Damage Threshold (LIDT) setup has been developed to test the layers under laser flux. We describe the used methods and different results are given. Preliminary results obtained on several coated samples with variable elastic moduli are presented. We show that whatever are the elastic stiffness of the AR coating, an overall decrease of the threshold appears with no noticeable effect of the mechanical properties of the AR coatings. Some possible explanations are given.

Wide band antireflective coatings Al2O3 / HfO2 / MgF2 for UV region

NASA Astrophysics Data System (ADS)

Winkowski, P.; Marszałek, Konstanty W.

2013-07-01

Deposition technology of the three layers antireflective coatings consists of hafnium compound are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5x10-5 mbar in presence of oxygen and fluoride films by thermal evaporation. Substrate temperature was 250°C. Coatings were deposited onto optical lenses made from quartz glass (Corning HPFS). Thickness and deposition rate were controlled by thickness measuring system Inficon XTC/2. Simulations leading to optimization of thickness and experimental results of optical measurements carried during and after deposition process were presented. Physical thickness measurements were made during deposition process and were equal to 43 nm/74 nm/51 nm for Al2O3 / HfO2 / MgF2 respectively. Optimization was carried out for ultraviolet region from 230nm to the beginning of visible region 400 nm. In this region the average reflectance of the antireflective coating was less than 0.5% in the whole range of application.

Ellipsometry of single-layer antireflection coatings on transparent substrates

NASA Astrophysics Data System (ADS)

Azzam, R. M. A.

2017-11-01

The complex reflection coefficients of p- and s-polarized light and ellipsometric parameters of a transparent substrate of refractive index n2, which is coated by a transparent thin film whose refractive index n1 =√{n2 } satisfies the anti-reflection condition at normal incidence, are considered as functions of film thickness d and angle of incidence ϕ. A unique coated surface, with n1 =√{n2 } and film thickness d equal to half of the film-thickness period Dϕ at angle ϕ and wavelength λ, reflects light of the same wavelength without change of polarization for all incident polarization states. (The reflection Jones matrix of such coated surface is the 2 × 2 identity matrix pre-multiplied by a scalar, hence tanΨ = 1,Δ = 0.) To monitor the deposition of an antireflection coating, the normalized Stokes parameters of obliquely reflected light (e.g. at ϕ =70∘) are measured until predetermined target values of those parameters are detected. This provides a more accurate means of film thickness control than is possible using a micro-balance technique or an intensity reflectance method.

Structured Antireflective Coating for Silicon at Submillimeter Frequencies

NASA Astrophysics Data System (ADS)

Padilla, Estefania

2018-01-01

Observations at millimeter and submillimeter wavelengths are useful for many astronomical studies, such as the polarization of the cosmic microwave background or the formation and evolution of galaxy clusters. In order to allow observations over a broad spectral bandwidth (approximatively from 70 to 420 GHz), innovative broadband anti-reflective (AR) optics must be utilized in submillimeter telescopes. Due to its low loss and high refractive index, silicon is a fine optical material at these frequencies, but an AR coating with multiple layers is required to maximize its transmission over a wide bandwidth. Structured multilayer AR coatings for silicon are currently being developed at Caltech and JPL. The development process includes the design of the structured layers with commercial electromagnetic simulation software, the fabrication by using deep reactive ion etching, and the test of the transmission and reflection of the patterned wafers. Geometrical 3D patterns have successfully been etched at the surface of the silicon wafers creating up to 2 layers with different effective refractive indices. The transmission and reflection of single AR layer wafers, measured between 75 and 330 GHz, are close to the simulation predictions. These results allow the development of new designs with 5 or 6 AR layers in order to improve the bandwidth and transmission of the silicon AR coatings.

Preparation and stress evolution of sol–gel SiO{sub 2} antireflective coatings for small-size anisotropic lithium triborate crystals

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tian, Bingtao; Wang, Xiaodong, E-mail: xiaodong-wang@tongji.edu.cn; Niu, Yanyan

2016-04-15

Lithium triborate (LiB{sub 3}O{sub 5}, LBO) crystal is now one of the most useful nonlinear optical materials for frequency conversion of high power lasers. The use of the crystal, however, has been hampered by the unavailability of antireflective (AR) coatings with high laser damage resistance. In this work, a “point contact” dip-coating method is developed to prepare sol–gel SiO{sub 2} AR coatings on small-size LBO crystals. Using this approach, we obtain a homogenous coating surface on an 8 mm×8 mm×3 mm LBO crystal. The stress measurements show that the stresses in sol–gel SiO{sub 2} coatings vary with the time ofmore » natural drying, which is beyond our expectation. The anisotropic Young’s modulus of the LBO crystal and the different evolution tendency of the stress in the different SiO{sub 2} coating layers are found to be responsible for the crack of the double-layer AR coatings on anisotropic LBO crystal. Meanwhile, the resulting coatings on LBO crystal achieve a LIDT of over 15 J/cm{sup 2} (532 nm, 3ns) and the coated LBO is expected to have a transmittance of over 99% at 800 nm.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Li, Xiaoyu; Graduate University of Chinese Academy of Sciences, Beijing 100049; He, Junhui, E-mail: jhhe@mail.ipc.ac.cn

Graphical abstract: High performance broadband antireflective and water-repellent coatings were fabricated on glass substrates, which can improve the short-circuit current of solar cells as much as 6.6% in comparison with glass substrates without the coatings. - Highlights: • Broadband anti-reflective and water-repellent coatings were fabricated. • Transmittance increased to 99.0%, significantly higher than that of commercial solar glasses. • The performance of standard solar cells with the AR coating was enhanced as much as 6.6%. - Abstract: High performance broadband antireflective (AR) and water-repellent coatings were fabricated on glass substrates by assembly of silica nanoparticles and polyelectrolytes via the layer-by-layermore » (LbL) assembly technique, followed by calcination and hydrophobic modification. A porous poly(diallyladimethylammonium chloride) (PDDA)/20 nm SiO{sub 2} nanoparticles (S-20) multilayer coating with AR property was prepared first. The maximum transmittance is as high as 99.0%, while that of the glass substrate is only 91.3%. After calcination and hydrophobic modification, the coating became water-repellent while maintaining the good AR property. Such water-repellent AR coatings can improve the short-circuit current of solar cells as much as 6.6% in comparison with glass substrates without the coatings. Scanning electron microscopy (SEM) was used to observe the morphology and thickness of coatings. Transmission spectra and reflection spectra were characterized by UV–vis spectrophotometer. The surface wettability was studied by a contact angle/interface system.« less

Design of a three-layer antireflection coating for high efficiency indium phosphide solar cells using a chemical oxide as first layer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Moulot, J.; Faur, M.; Faur, M.

1995-10-01

It is well known that the behavior of III-V compound based solar cells is largely controlled by their surface, since the majority of light generated carriers (63% for GaAs and 79% for InP) are created within 0.2 mu m of the surface of the illuminated cell. Consequently, the always observed high surface recombination velocity (SRV) on these cells is a serious limiting factor for their high efficiency performance, especially for those with p-n junction made by either thermal diffusion or ion implantation. A good surface passivation layer, ideally a grown oxide as opposed to a deposited one, will cause amore » significant reduction in the SRV without adding interface problems, thus improving the performance of III-V compound based solar cells. Another significant benefit to the overall performance of the solar cells can be achieved by a substantial reduction of their large surface optical reflection by the use of a well designed antireflection (AR) coating. In this paper, the authors demonstrate the effectiveness of using a chemically grown thermally and chemically stable oxide, not only for surface passivation but also as an integral part of a 3-layer AR coating for thermally diffused p+n InP solar cells. A phosphorus-rich interfacial oxide, In(PO3)3, is grown at the surface of the p+ emitter using an etchant based on HNO3, o-H3PO4 and H2O2. This oxide has the unique properties of passivating the surface as well as serving as an efficient antireflective layer yielding a measured record high AMO open-circuit voltage of 890.3 mV on a thermally diffused InP(Cd,S) solar cell. Unlike conventional single layer AR coatings such as ZnS, Sb2O3, SiO or double layer AR coatings such as ZnS/MgF2 deposited by e-beam or resistive evaporation, this oxide preserves the stoichiometry of the InP surface.« less

Nonspecular reflection of light at an inhomogeneous interface between two media and in a nanostructured layer with a quasi-zero refractive index

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gadomsky, O. N., E-mail: gadomsky@mail.ru; Gadomskaya, I. V.

2015-02-15

We have derived formulas for the amplitudes of light reflection and refraction at an inhomogeneous interface between two media and in a nanostructured layer with a quasi-zero refractive index. These formulas are applied to explain the experimental spectra of nonspecular light reflection using a nanostructured (PMMA + Ag) layer with silver nanoparticles on a silicon surface as an example. We show that a surface wave is formed in the nanostructured layer at various angles of light incidence and the layer with a quasi-zero refractive index is an antireflection coating that provides uniform 5% silicon antireflection in the wavelength range frommore » 450 to 1000 nm.« less

Antireflective graded index silica coating, method for making

DOEpatents

Yoldas, Bulent E.; Partlow, Deborah P.

1985-01-01

Antireflective silica coating for vitreous material is substantially non-reflecting over a wide band of radiations. This is achieved by providing the coating with a graded degree of porosity which grades the index of refraction between that of air and the vitreous material of the substrate. To prepare the coating, there is first prepared a silicon-alkoxide-based coating solution of particular polymer structure produced by a controlled proportion of water to alkoxide and a controlled concentration of alkoxide to solution, along with a small amount of catalyst. The primary solvent is alcohol and the solution is polymerized and hydrolized under controlled conditions prior to use. The prepared solution is applied as a film to the vitreous substrate and rapidly dried. It is thereafter heated under controlled conditions to volatilize the hydroxyl radicals and organics therefrom and then to produce a suitable pore morphology in the residual porous silica layer. The silica layer is then etched in order to enlarge the pores in a graded fashion, with the largest of the pores remaining being sufficiently small that radiations to be passed through the substrate are not significantly scattered. For use with quartz substrates, extremely durable coatings which display only 0.1% reflectivity have been prepared.

Anti-reflective coating with a conductive indium tin oxide layer on flexible glass substrates.

PubMed

Sung, Yilin; Malay, Robert E; Wen, Xin; Bezama, Christian N; Soman, Varun V; Huang, Ming-Huang; Garner, Sean M; Poliks, Mark D; Klotzkin, David

2018-03-20

Flexible glass has many applications including photovoltaics, organic light-emitting device (OLED) lighting, and displays. Its ability to be processed in a roll-to-roll facility enables high-throughput continuous manufacturing compared to conventional glass processing. For photovoltaic, OLED lighting, and display applications, transparent conductors are required with minimal optical reflection losses. Here, we demonstrate an anti-reflective coating (ARC) that incorporates a useful transparent conductor that is realizable on flexible substrates. This reduces the average reflectivity to less than 6% over the visible band from normal incidence to incident angles up to 60°. This ARC is designed by the average uniform algorithm method. The coating materials consist of a multilayer stack of an electrically functional conductive indium tin oxide with conductivity 2.95×10 5   Siemens/m (31 Ω/□), and AlSiO 2 . The coatings showed modest changes in reflectivity and no delamination after 10,000 bending cycles. This demonstrates that effective conductive layers can be integrated into ARCs and can be realized on flexible glass substrates with proper design and process control.

High performance and thermally stable tandem solar selective absorber coating for concentrated solar thermal power (CSP) application

NASA Astrophysics Data System (ADS)

Prasad, M. Shiva; Kumar, K. K. Phani; Atchuta, S. R.; Sobha, B.; Sakthivel, S.

2018-05-01

A novel tandem absorber system (Mn-Cu-Co-Ox-ZrO2/SiO2) developed on an austenitic stainless steel (SS-304) substrate to show an excellent optical performance (αsol: 0.96; ɛ: 0.23@500 °C). In order to achieve this durable tandem, we experimented with two antireflective layers such as ZrO2-SiO2 and nano SiO2 layer on top of Mn-Cu-Co-Ox-ZrO2 layer. We optimized the thickness of antireflective layers to get good tandem system in terms of solar absorptance and emittance. Field emission scanning electron microscopy (FESEM), UV-Vis-NIR and Fourier transform infrared spectroscopy (FTIR) were used to characterize the developed coatings. Finally, the Mn-Cu-Co-Ox-ZrO2/SiO2 exhibits high temperature resistance up to 800 °C, thus allow an increase in the operating temperature of CSP which may lead to high efficiency. We successfully developed a high temperature resistant tandem layer with easy manufacturability at low cost which is an attractive candidate for concentrated solar power generation (CSP).

Heterojunction solar cell

DOEpatents

Olson, Jerry M.

1994-01-01

A high-efficiency single heterojunction solar cell wherein a thin emitter layer (preferably Ga.sub.0.52 In.sub.0.48 P) forms a heterojunction with a GaAs absorber layer. The conversion effiency of the solar cell is at least 25.7%. The solar cell preferably includes a passivating layer between the substrate and the absorber layer. An anti-reflection coating is preferably disposed over the emitter layer.

Laser-induced damage threshold measurements of optical dielectric coatings at lambda = 1.06 micron

NASA Astrophysics Data System (ADS)

Milev, I. Ia.; Dimov, S. S.; Terziev, D. V.; Iordanova, J. I.; Todorova, L. B.; Gelkova, A. B.

1991-10-01

The laser-induced damage thresholds for lambda = 1.06 micron of commercially available dielectric optical coatings, both antireflective and high reflectance, have been determined. The dependence of the optical coatings stability on design and selection of materials has been investigated. An improvement of the coatings durability by using nonquarterwave layers in addition to the basic design of the mirrors has been obtained. The choice of the coating materials is also discussed.

Vacuum deposited optical coatings experiment

NASA Technical Reports Server (NTRS)

Charlier, Jean

1992-01-01

The 138-4 Frecopa experiment consisted of 20 sorts of optical components and coatings subjected to space exposure. They covered a large range of use from the UV to IR spectrum: filters, mirrors, dichroics, beam splitters, and antireflection coatings made of several different materials as layers and substrates. By comparing pre- and post-flight spectral performances, it was possible to put into evidence the alterations due to space exposure.

One-step Maskless Fabrication and Optical Characterization of Silicon Surfaces with Antireflective Properties and a White Color Appearance

PubMed Central

Schneider, Ling; Feidenhans’l, Nikolaj A.; Telecka, Agnieszka; Taboryski, Rafael J.

2016-01-01

We report a simple one-step maskless fabrication of inverted pyramids on silicon wafers by reactive ion etching. The fabricated surface structures exhibit excellent anti-reflective properties: The total reflectance of the nano inverted pyramids fabricated by our method can be as low as 12% without any anti-reflective layers, and down to only 0.33% with a silicon nitride coating. The results from angle resolved scattering measurements indicate that the existence of triple reflections is responsible for the reduced reflectance. The surfaces with the nano inverted pyramids also exhibit a distinct milky white color. PMID:27725703

Design of a Three-Layer Antireflection Coating for High Efficiency Indium Phosphide Solar Cells Using a Chemical Oxide as First Layer

NASA Technical Reports Server (NTRS)

Moulot, Jacques; Faur, Mircea; Faur, Maria; Goradia, Chandra; Goradia, Manju; Bailey, Sheila

1995-01-01

It is well known that the behavior of III-V compound based solar cells is largely controlled by their surface, since the majority of light generated carriers (63% for GaAs and 79% for InP) are created within 0.2 microns of the illuminated surface of the cell. Consequently, the always observed high surface recombination velocity (SRV) on these cells is a serious limiting factor for their high efficiency performance, especially for those with the p-n junction made by either thermal diffusion or ion implantation. A good surface passivation layer, ideally, a grown oxide as opposed to a deposited one, will cause a significant reduction in the SRV without adding interface problems, thus improving the performance of III-V compound based solar cells. Another significant benefit to the overall performance of the solar cells can be achieved by a substantial reduction of their large surface optical reflection by the use of a well designed antireflection (AR) coating. In this paper, we demonstrate the effectiveness of using a chemically grown, thermally and chemically stable oxide, not only for surface passivation but also as an integral part of a 3- layer AR coating for thermally diffused p(+)n InP solar cells. A phosphorus-rich interfacial oxide, In(PO3)3, is grown at the surface of the p(+) emitter using an etchant based on HNO3, o-H3PO4 and H2O2. This oxide has the unique properties of passivating the surface as well as serving as a fairly efficient antireflective layer yielding a measured record high AM0, 25 C, open-circuit voltage of 890.3 mV on a thermally diffused InP(Cd,S) solar cell. Unlike conventional single layer AR coatings such as ZnS, Sb2O3, SiO or double layer AR coatings such as ZnS/MgF2 deposited by e-beam or resistive evaporation, this oxide preserves the stoichiometry of the InP surface. We show that it is possible to design a three-layer AR coating for a thermally diffused InP solar cell using the In(PO3)3 grown oxide as the first layer and Al2O3, MgF2 or ZnS, MgF2 as the second and third layers respectively, so as to yield an overall theoretical reflectance of less than 2%. Since chemical oxides are readily grown on III-V semiconductor materials, the technique of using the grown oxide layer to both passivate the surface as well as serve as the first of a multilayer AR coating, should work well for essentially all III-V compound-based solar cells.

Design of a three-layer antireflection coating for high efficiency indium phosphide solar cells using a chemical oxide as first layer

NASA Technical Reports Server (NTRS)

Moulot, Jacques; Faur, M.; Faur, M.; Goradia, C.; Goradia, M.; Bailey, S.

1995-01-01

It is well known that the behavior of III-V compound based solar cells is largely controlled by their surface, since the majority of light generated carriers (63% for GaAs and 79% for InP) are created within 0.2 mu m of the surface of the illuminated cell. Consequently, the always observed high surface recombination velocity (SRV) on these cells is a serious limiting factor for their high efficiency performance, especially for those with p-n junction made by either thermal diffusion or ion implantation. A good surface passivation layer, ideally a grown oxide as opposed to a deposited one, will cause a significant reduction in the SRV without adding interface problems, thus improving the performance of III-V compound based solar cells. Another significant benefit to the overall performance of the solar cells can be achieved by a substantial reduction of their large surface optical reflection by the use of a well designed antireflection (AR) coating. In this paper, we demonstrate the effectiveness of using a chemically grown thermally and chemically stable oxide, not only for surface passivation but also as an integral part of a 3-layer AR coating for thermally diffused p+n InP solar cells. A phosphorus-rich interfacial oxide, In(PO3)3, is grown at the surface of the p+ emitter using an etchant based on HNO3, o-H3PO4 and H2O2. This oxide has the unique properties of passivating the surface as well as serving as an efficient antireflective layer yielding a measured record high AMO open-circuit voltage of 890.3 mV on a thermally diffused InP(Cd,S) solar cell. Unlike conventional single layer AR coatings such as ZnS, Sb2O3, SiO or double layer AR coatings such as ZnS/MgF2 deposited by e-beam or resistive evaporation, this oxide preserves the stoichiometry of the InP surface. We show that it is possible to design a three-layer AR coating for a thermally diffused InP solar cell using the In(PO3)3 grown oxide as the first layer and Al2O3 and MgF2 as the second and third layers respectively, so as to yield an overall theoretical reflectance of less than 2%. Since chemical oxides are readily grown on III-V semiconductors materials, the technique of using the grown oxide layer to both passivate the surface as well as serve as the first of a multilayer AR coating should work well for all III-V compound-based solar cells.

MANTECH Project Book, 1992

DTIC Science & Technology

1992-01-01

RUGATE FILTER PROCESS AND PRODUCTION ................ 111 MANUFACTURING SCIENCE FOR TITANIUM ALUMINIDE COMPOSITE ENGINE STRU CTURES...rejection and mission filters , anti-reflection coatings, and dichroic layers which can have demanding optical requirements. Rugate m coatings can be used to...SCIENCE RUGATE FILTER PROCESS AND PRODUCTION CONTRACT NUMBER: F33615-86-C-5059STATEMENT OF NEED Achieving the optical performance specifications for

Omnidirectional anti-reflection properties of vertically align SiO2 nanorod films prepared by electron beam evaporation with glancing angle deposition

NASA Astrophysics Data System (ADS)

Prachachet, R.; Samransuksamer, B.; Horprathum, M.; Eiamchai, P.; Limwichean, S.; Chananonnawathorn, C.; Lertvanithphol, T.; Muthitamongkol, P.; Boonruang, S.; Buranasiri, P.

2018-03-01

Omnidirectional anti-reflection coating nanostructure film have attracted enormous attention for the developments of the optical coating, lenses, light emitting diode, display and photovoltaic. However, fabricated of the omnidirectional antireflection nanostructure film on glass substrate in large area was a challenge topic. In the past two decades, the invention of glancing angle deposition technique as a growth of well-controlled two and three-dimensional morphologies has gained significant attention because of it is simple, fast, cost-effective and high mass production capability. In this present work, the omnidirectional anti-reflection nanostructure coating namely silicon dioxide (SiO2) nanorods has been investigated for optimized high transparent layer at all light incident angle. The SiO2 nanorod films of an optimally low refractive index have been fabricated by electron beam evaporation with the glancing angle deposition technique. The morphological of the prepared sampled were characterized by field-emission scanning electron microscope (FE-SEM) and high-resolution transmission electron microscope (HRTEM). The optical transmission and omnidirectional property of the SiO2 nanorod films were investigated by UV-Vis-NIR spectrophotometer. The measurement were performed at normal incident angle and a full spectral range of 200 - 2000 nm. The angle dependent transmission measure were investigated by rotating the specimen, with incidence angle defined relative to the surface normal of the prepared samples. The morphological characterization results showed that when the glancing angle deposition technique was applied, the vertically align SiO2 nanorods with partially isolated columnar structure can be constructed due to the enhanced shadowing and limited addtom diffusion effect. The average transmission of the vertically align SiO2 nanorods were higher than the glass substrate reference sample over the visible wavelength range at all incident angle due to the transition in the refractive index profile from air to the nanostructure layer that improved the anti-reflection characteristics.

Self-assembled biomimetic antireflection coatings

NASA Astrophysics Data System (ADS)

Linn, Nicholas C.; Sun, Chih-Hung; Jiang, Peng; Jiang, Bin

2007-09-01

The authors report a simple self-assembly technique for fabricating antireflection coatings that mimic antireflective moth eyes. Wafer-scale, nonclose-packed colloidal crystals with remarkable large hexagonal domains are created by a spin-coating technology. The resulting polymer-embedded colloidal crystals exhibit highly ordered surface modulation and can be used directly as templates to cast poly(dimethylsiloxane) (PDMS) molds. Moth-eye antireflection coatings with adjustable reflectivity can then be molded against the PDMS master. The specular reflection of replicated nipple arrays matches the theoretical prediction using a thin-film multilayer model. These biomimetic films may find important technological application in optical coatings and solar cells.

Heterojunction solar cell

DOEpatents

Olson, J.M.

1994-08-30

A high-efficiency single heterojunction solar cell is described wherein a thin emitter layer (preferably Ga[sub 0.52]In[sub 0.48]P) forms a heterojunction with a GaAs absorber layer. The conversion efficiency of the solar cell is at least 25.7%. The solar cell preferably includes a passivating layer between the substrate and the absorber layer. An anti-reflection coating is preferably disposed over the emitter layer. 1 fig.

Effects of chloride additives on the mechanical stability and environmental durability of porous MgF2 thin films

NASA Astrophysics Data System (ADS)

Schütz, F.; Scheurell, K.; Scholz, G.; Kemnitz, E.

2016-09-01

Porous antireflective thin films, prepared of nanoscopic MgF2 sols, exhibit a low refraction index and are useful for various optical applications. Due to their porosity, film stability and durability suffer from mechanical abrasion and water solubility, respectively. Hence, we present approaches of improved mechanical stability of MgF2 layers induced by chloride addition. Antireflective (AR) films were produced by dip-coating followed by thermal treatment. Afterwards, film stability and environmental durability was strained by crockmeter and water stability tests, respectively. In comparison to films prepared from chloride-free MgF2 sols, chloride mingled sols form coatings with increased mechanical stability and a lower solubility.

InAlAs photovoltaic cell design for high device efficiency

DOE PAGES

Smith, Brittany L.; Bittner, Zachary S.; Hellstroem, Staffan D.; ...

2017-04-17

This study presents a new design for a single-junction InAlAs solar cell, which reduces parasitic absorption losses from the low band-gap contact layer while maintaining a functional window layer by integrating a selective etch stop. The etch stop is then removed prior to depositing an anti-reflective coating. The final cell had a 17.9% efficiency under 1-sun AM1.5 with an anti-reflective coating. Minority carrier diffusion lengths were extracted from external quantum efficiency data using physics-based device simulation software yielding 170 nm in the n-type emitter and 4.6 um in the p-type base, which is more than four times the diffusion lengthmore » previously reported for a p-type InAlAs base. In conclusion, this report represents significant progress towards a high-performance InAlAs top cell for a triple-junction design lattice-matched to InP.« less

Anti-reflection coating design for metallic terahertz meta-materials

DOE PAGES

Pancaldi, Matteo; Freeman, Ryan; Hudl, Matthias; ...

2018-01-26

We demonstrate a silicon-based, single-layer anti-reflection coating that suppresses the reflectivity of metals at near-infrared frequencies, enabling optical probing of nano-scale structures embedded in highly reflective surroundings. Our design does not affect the interaction of terahertz radiation with metallic structures that can be used to achieve terahertz near-field enhancement. We have verified the functionality of the design by calculating and measuring the reflectivity of both infrared and terahertz radiation from a silicon/gold double layer as a function of the silicon thickness. We have also fabricated the unit cell of a terahertz meta-material, a dipole antenna comprising two 20-nm thick extendedmore » gold plates separated by a 2 μm gap, where the terahertz field is locally enhanced. We used the time-domain finite element method to demonstrate that such near-field enhancement is preserved in the presence of the anti-reflection coating. Finally, we performed magneto-optical Kerr effect measurements on a single 3-nm thick, 1-μm wide magnetic wire placed in the gap of such a dipole antenna. The wire only occupies 2% of the area probed by the laser beam, but its magneto-optical response can be clearly detected. Our design paves the way for ultrafast time-resolved studies, using table-top femtosecond near-infrared lasers, of dynamics in nano-structures driven by strong terahertz radiation.« less

Anti-reflection coating design for metallic terahertz meta-materials

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pancaldi, Matteo; Freeman, Ryan; Hudl, Matthias

We demonstrate a silicon-based, single-layer anti-reflection coating that suppresses the reflectivity of metals at near-infrared frequencies, enabling optical probing of nano-scale structures embedded in highly reflective surroundings. Our design does not affect the interaction of terahertz radiation with metallic structures that can be used to achieve terahertz near-field enhancement. We have verified the functionality of the design by calculating and measuring the reflectivity of both infrared and terahertz radiation from a silicon/gold double layer as a function of the silicon thickness. We have also fabricated the unit cell of a terahertz meta-material, a dipole antenna comprising two 20-nm thick extendedmore » gold plates separated by a 2 μm gap, where the terahertz field is locally enhanced. We used the time-domain finite element method to demonstrate that such near-field enhancement is preserved in the presence of the anti-reflection coating. Finally, we performed magneto-optical Kerr effect measurements on a single 3-nm thick, 1-μm wide magnetic wire placed in the gap of such a dipole antenna. The wire only occupies 2% of the area probed by the laser beam, but its magneto-optical response can be clearly detected. Our design paves the way for ultrafast time-resolved studies, using table-top femtosecond near-infrared lasers, of dynamics in nano-structures driven by strong terahertz radiation.« less

Anti-reflection coating design for metallic terahertz meta-materials.

PubMed

Pancaldi, Matteo; Freeman, Ryan; Hudl, Matthias; Hoffmann, Matthias C; Urazhdin, Sergei; Vavassori, Paolo; Bonetti, Stefano

2018-02-05

We demonstrate a silicon-based, single-layer anti-reflection coating that suppresses the reflectivity of metals at near-infrared frequencies, enabling optical probing of nano-scale structures embedded in highly reflective surroundings. Our design does not affect the interaction of terahertz radiation with metallic structures that can be used to achieve terahertz near-field enhancement. We have verified the functionality of the design by calculating and measuring the reflectivity of both infrared and terahertz radiation from a silicon/gold double layer as a function of the silicon thickness. We have also fabricated the unit cell of a terahertz meta-material, a dipole antenna comprising two 20-nm thick extended gold plates separated by a 2 μm gap, where the terahertz field is locally enhanced. We used the time-domain finite element method to demonstrate that such near-field enhancement is preserved in the presence of the anti-reflection coating. Finally, we performed magneto-optical Kerr effect measurements on a single 3-nm thick, 1-μm wide magnetic wire placed in the gap of such a dipole antenna. The wire only occupies 2% of the area probed by the laser beam, but its magneto-optical response can be clearly detected. Our design paves the way for ultrafast time-resolved studies, using table-top femtosecond near-infrared lasers, of dynamics in nano-structures driven by strong terahertz radiation.

High-Quality Hollow Closed-Pore Silica Antireflection Coatings Based on Styrene-Acrylate Emulsion @ Organic-Inorganic Silica Precursor.

PubMed

Guo, Zhaolong; Zhao, Haixin; Zhao, Wei; Wang, Tao; Kong, Depeng; Chen, Taojing; Zhang, Xiaoyan

2016-05-11

Making use of a facile and low-cost way for the preparation of a hierarchically organized novel hollow closed-pore silica antireflective coating (CHAR) with tailored optical properties and a mechanical reliability is of great interest in the field of solar photovoltaic technology. The process mainly contains two aspects: (1) a styrene-acrylate emulsion @ organic-inorganic silica precursor (SA@OISP) core/shell hierarchical nanostructure, consisting of a sacrificial styrene-acrylate (SA) primary template, was fabricated using a sol-gel method; (2) the self-assembly of the nanostructures leads to SA@OISP nanospheres forming the high-quality hollow closed-pore silica antireflection coating (CHAR) by a dip-coating process and a subsequent calcination treatment. The resulting SA@OISP nanospheres have a mean diameter of 65.2 nm and contained a SA soft core with a mean diameter of approximately 54.8 nm and an organic-inorganic silica precursor (OISP) shell with a thickness of approximately 6-10 nm. Furthermore, the prepared CHAR film exhibited a high transmittance and good ruggedness. An average transmittance (TAV) of 97.64% was obtained, and the value is close to the ideal single-layered antireflection coating (98.09%) over a broad range of wavelengths (from 380 to 1100 nm). The CHAR film showed a stable TAV, with attenuation values of less than 0.8% and 0.43% after the abrasion test and the damp heat test, respectively. The conversion efficiency of the CHAR coating cover solar modules tends to be increased by 3.75%. The promising results obtained in this study suggest that the CHAR film was considered as an essential component of the solar module and were expected to provide additional solar energy harvest under extreme outdoor climates.

How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO 2/SiO 2 antireflection and high reflection coatings.

DOE PAGES

Field, Ella Suzanne; Bellum, John Curtis; Kletecka, Damon E.

2016-06-01

Optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out ofmore » commission. In light of this circumstance, we explored how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. Finally, the coatings of this study consist of HfO 2 and SiO 2 layer materials and include antireflection coatings for 527 nm at normal incidence, and high reflection coatings for 527 nm, 45⁰ angle of incidence (AOI), in P-polarization (P-pol).« less

How reduced vacuum pumping capability in a coating chamber affects the laser damage resistance of HfO 2/SiO 2 antireflection and high-reflection coatings

DOE PAGES

Field, Ella S.; Bellum, John C.; Kletecka, Damon E.

2016-07-15

Here, optical coatings with the highest laser damage thresholds rely on clean conditions in the vacuum chamber during the coating deposition process. A low-base pressure in the coating chamber, as well as the ability of the vacuum system to maintain the required pressure during deposition, are important aspects of limiting the amount of defects in an optical coating that could induce laser damage. Our large optics coating chamber at Sandia National Laboratories normally relies on three cryo pumps to maintain low pressures for e-beam coating processes. However, on occasion, one or more of the cryo pumps have been out ofmore » commission. In light of this circumstance, we explored how deposition under compromised vacuum conditions resulting from the use of only one or two cryo pumps affects the laser-induced damage thresholds of optical coatings. The coatings of this study consist of HfO 2 and SiO 2 layer materials and include antireflection coatings for 527 nm at normal incidence and high-reflection coatings for 527 nm at 45-deg angle of incidence in P-polarization.« less

Process and design considerations for high-efficiency solar cells

NASA Technical Reports Server (NTRS)

Rohati, A.; Rai-Choudhury, P.

1985-01-01

This paper shows that oxide surface passivation coupled with optimum multilayer anti-reflective coating can provide approx. 3% (absolute) improvement in solar cell efficiency. Use of single-layer AR coating, without passivation, gives cell efficiencies in the range of 15 to 15.5% on high-quality, 4 ohm-cm as well as 0.1 to 0.2 ohm-cm float-zone silicon. Oxide surface passivation alone raises the cell efficiency to or = 17%. An optimum double-layer AR coating on oxide-passivated cells provides an additional approx. 5 to 10% improvement over a single-layer AR-coated cell, resulting in cell efficiencies in excess of 18%. Experimentally observed improvements are supported by model calculations and an approach to or = 20% efficient cells is discussed.

Silicon Nitride Antireflection Coatings for Photovoltaic Cells

NASA Technical Reports Server (NTRS)

Johnson, C.; Wydeven, T.; Donohoe, K.

1984-01-01

Chemical-vapor deposition adapted to yield graded index of refraction. Silicon nitride deposited in layers, refractive index of which decreases with distance away from cell/coating interface. Changing index of refraction allows adjustment of spectral transmittance for wavelengths which cell is most effective at converting light to electric current. Average conversion efficiency of solar cells increased from 8.84 percent to 12.63 percent.

Sequential Infiltration Synthesis for the Design of Low Refractive Index Surface Coatings with Controllable Thickness

DOE Office of Scientific and Technical Information (OSTI.GOV)

Berman, Diana; Guha, Supratik; Lee, Byeongdu

Control over refractive index and thickness of surface coatings is central to the design of low refraction films used in applications ranging from optical computing to antireflective coatings. Here, we introduce gas-phase sequential infiltration synthesis (SIS) as a robust, powerful and efficient approach to deposit conformal coatings with very low refractive indices. We demonstrate that the refractive indices of inorganic coatings can be efficiently tuned by the number of cycles used in the SIS process, composition and selective swelling of the of the polymer template. We show that the refractive index of Al 2O 3 can be lowered from 1.76more » down to 1.1 using this method. The thickness of the Al 2O 3 coating can be efficiently controlled by the swelling of the block copolymer template in ethanol at elevated temperature, thereby enabling deposition of both single-layer and graded-index broadband anti-reflective coatings. Using this technique, Fresnel reflections of glass can be reduced to as low as 0.1% under normal illumination over a broad spectral range.« less

Sequential Infiltration Synthesis for the Design of Low Refractive Index Surface Coatings with Controllable Thickness

DOE PAGES

Berman, Diana; Guha, Supratik; Lee, Byeongdu; ...

2017-01-31

Control over refractive index and thickness of surface coatings is central to the design of low refraction films used in applications ranging from optical computing to antireflective coatings. Here, we introduce gas-phase sequential infiltration synthesis (SIS) as a robust, powerful and efficient approach to deposit conformal coatings with very low refractive indices. We demonstrate that the refractive indices of inorganic coatings can be efficiently tuned by the number of cycles used in the SIS process, composition and selective swelling of the of the polymer template. We show that the refractive index of Al 2O 3 can be lowered from 1.76more » down to 1.1 using this method. The thickness of the Al 2O 3 coating can be efficiently controlled by the swelling of the block copolymer template in ethanol at elevated temperature, thereby enabling deposition of both single-layer and graded-index broadband anti-reflective coatings. Using this technique, Fresnel reflections of glass can be reduced to as low as 0.1% under normal illumination over a broad spectral range.« less

Sequential Infiltration Synthesis for the Design of Low Refractive Index Surface Coatings with Controllable Thickness

DOE Office of Scientific and Technical Information (OSTI.GOV)

Berman, Diana; Guha, Supratik; Lee, Byeongdu

Control over refractive index and thickness of surface coatings is central to the design of low refraction films used in applications ranging from optical computing to antireflective coatings. Here, we introduce gas-phase sequential infiltration synthesis (SIS) as a robust, powerful, and efficient approach to deposit conformal coatings with very low refractive indices. We demonstrate that the refractive indices of inorganic coatings can be efficiently tuned by the number of cycles used in the SIS process, composition, and selective swelling of the of the polymer template. We show that the refractive index of Al2O3 can be lowered from 1.76 down tomore » 1.1 using this method. The thickness of the Al2O3 coating can be efficiently controlled by the swelling of the block copolymer template in ethanol at elevated temperature, thereby enabling deposition of both single-layer and graded-index broadband antireflective coatings. Using this technique, Fresnel reflections of glass can be reduced to as low as 0.1% under normal illumination over a broad spectral range.« less

Sequential Infiltration Synthesis for the Design of Low Refractive Index Surface Coatings with Controllable Thickness.

PubMed

Berman, Diana; Guha, Supratik; Lee, Byeongdu; Elam, Jeffrey W; Darling, Seth B; Shevchenko, Elena V

2017-03-28

Control over refractive index and thickness of surface coatings is central to the design of low refraction films used in applications ranging from optical computing to antireflective coatings. Here, we introduce gas-phase sequential infiltration synthesis (SIS) as a robust, powerful, and efficient approach to deposit conformal coatings with very low refractive indices. We demonstrate that the refractive indices of inorganic coatings can be efficiently tuned by the number of cycles used in the SIS process, composition, and selective swelling of the of the polymer template. We show that the refractive index of Al 2 O 3 can be lowered from 1.76 down to 1.1 using this method. The thickness of the Al 2 O 3 coating can be efficiently controlled by the swelling of the block copolymer template in ethanol at elevated temperature, thereby enabling deposition of both single-layer and graded-index broadband antireflective coatings. Using this technique, Fresnel reflections of glass can be reduced to as low as 0.1% under normal illumination over a broad spectral range.

New temperable solar coatings: Tempsol

NASA Astrophysics Data System (ADS)

Demiryont, Hulya

2001-11-01

This paper deals with the large area deposition and coating properties of the thermo-stable (temperable/bendable) solar coating material, CuO, and some new optical coating systems comprising CuO films for architectural and automotive/transportation applications. The CuO solar coating is combined with other coating layers, for example, an anti-reflection film, a reflection film, a coloration coating layer, etc., which are also thermo-stable. The film systems are developed at the research laboratory by D.C. Magnetron reactive sputtering process. The new developed technologies then transferred to the production line. Product performances are compared before and after heat treatment of the coating systems. Performance tables and other physical properties, including optical parameters, mechanical and environmental stability, storage properties, etc., are also presented for this new product series.

Sol-gel derived antireflective structures for applications in silicon solar cells

NASA Astrophysics Data System (ADS)

Karasiński, Paweł; Skolik, Marcin

2016-12-01

This work presents theoretical and experimental results of antireflective coatings (ARCs) obtained for applications in silicon solar cells. ARCs were derived from sol-gel process and dip-coated using silica (SiO2) and titania (TiO2). Theoretical results were obtained using 2×2 transfer matrix calculation method. Technological process of SiO2 and TiO2 thin film fabrication as well as measurement techniques are described in this paper. Strong correlation between theoretical and experimental data is demonstrated. It is shown, that weighted average reflection from a substrate can be reduced ten times with the use of SiO2/TiO2/Si double layer ARCs, when compared to a bare silica substrate.

Optical coatings on polymers

NASA Astrophysics Data System (ADS)

Bauer, Thomas

2005-09-01

Optical transparent polymers are used for technical optics for more than 50 years and currently replace glass as optical material in several application fields. Optical functional coatings like mirrors, filters, beam splitters and anti-reflection coatings gain increasingly in importance. New light sources and head mounted systems need light and effective reflector designs. The paper gives an overview about vacuum coating technologies for metal and dielectric layers on polymers for technical optics. Especially for polymers controlling the complete process chain from injection moulding to storing, coating and shipping decides on the technological and commercial success.

Heterojunction solar cell with passivated emitter surface

DOEpatents

Olson, Jerry M.; Kurtz, Sarah R.

1994-01-01

A high-efficiency heterojunction solar cell wherein a thin emitter layer (preferably Ga.sub.0.52 In.sub.0.48 P) forms a heterojunction with a GaAs absorber layer. A passivating window layer of defined composition is disposed over the emitter layer. The conversion efficiency of the solar cell is at least 25.7%. The solar cell preferably includes a passivating layer between the substrate and the absorber layer. An anti-reflection coating is preferably disposed over the window layer.

Heterojunction solar cell with passivated emitter surface

DOEpatents

Olson, J.M.; Kurtz, S.R.

1994-05-31

A high-efficiency heterojunction solar cell is described wherein a thin emitter layer (preferably Ga[sub 0.52]In[sub 0.48]P) forms a heterojunction with a GaAs absorber layer. A passivating window layer of defined composition is disposed over the emitter layer. The conversion efficiency of the solar cell is at least 25.7%. The solar cell preferably includes a passivating layer between the substrate and the absorber layer. An anti-reflection coating is preferably disposed over the window layer. 1 fig.

Plasmonic layers based on Au-nanoparticle-doped TiO2 for optoelectronics: structural and optical properties.

PubMed

Pedrueza, E; Sancho-Parramon, J; Bosch, S; Valdés, J L; Martinez-Pastor, J P

2013-02-15

The anti-reflective effect of dielectric coatings used in silicon solar cells has traditionally been the subject of intensive studies and practical applications. In recent years the interest has permanently grown in plasmonic layers based on metal nanoparticles, which are shown to increase light trapping in the underlying silicon. In the present work we have combined these two concepts by means of in situ synthesis of Au nanoparticles in a dielectric matrix (TiO2), which is commonly used as an anti-reflective coating in silicon solar cells, and added the third element: a 10-20% porosity in the matrix. The porosity is formed by means of a controllable wet etching by low concentration HF. As a consequence, the experimentally measured reflectance of silicon coated by such a plasmonic layer decreases to practically zero in a broad wavelength region around the localized surface plasmon resonance. Furthermore, we demonstrate that extinction and reflectance spectra of silicon coated by the plasmonic films can be successfully accounted for by means of Fresnel formulae, in which a double refractive index of the metal-dielectric material is used. This double refractive index cannot be explained by effective medium theory (Maxwell-Garnett, for example) and appears when the contribution of Au nanoparticles located at the TiO2/Si interface is high enough to result in formation of interface surface plasmon modes.

Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays.

PubMed

Park, Haesung; Shin, Dongheok; Kang, Gumin; Baek, Seunghwa; Kim, Kyoungsik; Padilla, Willie J

2011-12-22

Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer

DOEpatents

Chow, Robert; Loomis, Gary E.; Thomas, Ian M.

1999-01-01

Variable index optical single-layers, optical multilayer, and laser-resistant coatings were made from a perfluorinated amorphous polymer material by physical vapor deposition. This was accomplished by physically vapor depositing a polymer material, such as bulk Teflon AF2400, for example, to form thin layers that have a very low refractive index (.about.1.10-1.31) and are highly transparent from the ultra-violet through the near infrared regime, and maintain the low refractive index of the bulk material. The refractive index can be varied by simply varying one process parameter, either the deposition rate or the substrate temperature. The thus forming coatings may be utilized in anti-reflectors and graded anti-reflection coatings, as well as in optical layers for laser-resistant coatings at optical wavelengths of less than about 2000 nm.

Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

DOEpatents

Nishi, Mineo; Makishima, Hideo

1996-01-01

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

Fabrication of Refractive Index Tunable Coating with Moisture-Resistant Function for High-Power Laser Systems Based on Homogeneous Embedding of Surface-Modified Nanoparticles.

PubMed

Yang, Wei; Lei, Xiangyang; Hui, Haohao; Zhang, Qinghua; Deng, Xueran

2018-05-07

Moisture-resistant silicone coatings were prepared on the surface of potassium dihydrogen phosphate (KDP) crystal by means of spin-coating, in which hydrophobic-modified SiO₂ nanoparticles were embedded in a certain proportion. The refractive index of such coating can be tuned arbitrarily in the range of 1.21⁻1.44, which endows the KDP optical component with excellent transmission capability as well as the moisture proof effect. A dual-layer anti-reflective coating system was obtained by covering this silicone coating with a porous SiO₂ coating which is specially treated to enhance the moisture resistance. Transmittance of such a dual-layer coating system could reach 99.60% and 99.62% at 1064 nm and 532 nm, respectively, by precisely matching the refractive index of both layers. Furthermore, the long-term stability of this coating system has been verified at high humidity ambient of 80% RH for 27 weeks.

Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface

NASA Astrophysics Data System (ADS)

Yamamoto, Kazuya; Takaoka, Toshimitsu; Fukui, Hidetoshi; Haruta, Yasuyuki; Yamashita, Tomoya; Kitagawa, Seiichiro

2016-03-01

In general, thin-film coating process is widely applied on optical lens surface as anti-reflection function. In normal production process, at first lens is manufactured by molding, then anti-reflection is added by thin-film coating. In recent years, instead of thin-film coating, sub-wavelength structures adding on surface of molding die are widely studied and development to keep anti-reflection performance. As merits, applying sub-wavelength structure, coating process becomes unnecessary and it is possible to reduce man-hour costs. In addition to cost merit, these are some technical advantages on this study. Adhesion of coating depends on material of plastic, and it is impossible to apply anti-reflection function on arbitrary surface. Sub-wavelength structure can solve both problems. Manufacturing method of anti-reflection structure can be divided into two types mainly. One method is with the resist patterning, and the other is mask-less method that does not require patterning. What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.

Titanium dioxide antireflection coating for silicon solar cells by spray deposition

NASA Technical Reports Server (NTRS)

Kern, W.; Tracy, E.

1980-01-01

A high-speed production process is described for depositing a single-layer, quarter-wavelength thick antireflection coating of titanium dioxide on metal-patterned single-crystal silicon solar cells for terrestrial applications. Controlled atomization spraying of an organotitanium solution was selected as the most cost-effective method of film deposition using commercial automated equipment. The optimal composition consists of titanium isopropoxide as the titanium source, n-butyl acetate as the diluent solvent, sec-butanol as the leveling agent, and 2-ethyl-1-hexanol to render the material uniformly depositable. Application of the process to the coating of circular, large-diameter solar cells with either screen-printed silver metallization or with vacuum-evaporated Ti/Pd/Ag metallization showed increases of over 40% in the electrical conversion efficiency. Optical characteristics, corrosion resistance, and several other important properties of the spray-deposited film are reported. Experimental evidence indicates a wide tolerance in the coating thickness upon the overall efficiency of the cell. Considerations pertaining to the optimization of AR coatings in general are discussed, and a comprehensive critical survey of the literature is presented.

[Research on the photoelectric conversion efficiency of grating antireflective layer solar cells].

PubMed

Zhong, Hui; Gao, Yong-Yi; Zhou, Ren-Long; Zhou, Bing-ju; Tang, Li-qiang; Wu, Ling-xi; Li, Hong-jian

2011-07-01

A numerical investigation of the effect of grating antireflective layer structure on the photoelectric conversion efficiency of solar cells was carried out by the finite-difference time-domain method. The influence of grating shape, height and the metal film thickness coated on grating surface on energy storage was analyzed in detail. It was found that the comparison between unoptimized and optimized surface grating structure on solar cells shows that the optimization of surface by grating significantly increases the energy storage capability and greatly improves the efficiency, especially of the photoelectric conversion efficiency and energy storage of the triangle grating. As the film thickness increases, energy storage effect increases, while as the film thickness is too thick, energy storage effect becomes lower and lower.

Templated biomimetic multifunctional coatings

NASA Astrophysics Data System (ADS)

Sun, Chih-Hung; Gonzalez, Adriel; Linn, Nicholas C.; Jiang, Peng; Jiang, Bin

2008-02-01

We report a bioinspired templating technique for fabricating multifunctional optical coatings that mimic both unique functionalities of antireflective moth eyes and superhydrophobic cicada wings. Subwavelength-structured fluoropolymer nipple arrays are created by a soft-lithography-like process. The utilization of fluoropolymers simultaneously enhances the antireflective performance and the hydrophobicity of the replicated films. The specular reflectivity matches the optical simulation using a thin-film multilayer model. The dependence of the size and the crystalline ordering of the replicated nipples on the resulting antireflective properties have also been investigated by experiment and modeling. These biomimetic materials may find important technological application in self-cleaning antireflection coatings.

Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer

DOEpatents

Chow, R.; Loomis, G.E.; Thomas, I.M.

1999-03-16

Variable index optical single-layers, optical multilayer, and laser-resistant coatings were made from a perfluorinated amorphous polymer material by physical vapor deposition. This was accomplished by physically vapor depositing a polymer material, such as bulk Teflon AF2400, for example, to form thin layers that have a very low refractive index (ca. 1.10--1.31) and are highly transparent from the ultra-violet through the near infrared regime, and maintain the low refractive index of the bulk material. The refractive index can be varied by simply varying one process parameter, either the deposition rate or the substrate temperature. The thus forming coatings may be utilized in anti-reflectors and graded anti-reflection coatings, as well as in optical layers for laser-resistant coatings at optical wavelengths of less than about 2000 nm. 2 figs.

Fabrication of contacts for silicon solar cells including printing burn through layers

DOEpatents

Ginley, David S; Kaydanova, Tatiana; Miedaner, Alexander; Curtis, Calvin J; Van Hest, Marinus Franciscus Antonius Maria

2014-06-24

A method for fabricating a contact (240) for a solar cell (200). The method includes providing a solar cell substrate (210) with a surface that is covered or includes an antireflective coating (220). For example, the substrate (210) may be positioned adjacent or proximate to an outlet of an inkjet printer (712) or other deposition device. The method continues with forming a burn through layer (230) on the coating (220) by depositing a metal oxide precursor (e.g., using an inkjet or other non-contact printing method to print or apply a volume of liquid or solution containing the precursor). The method includes forming a contact layer (240) comprising silver over or on the burn through layer (230), and then annealing is performed to electrically connect the contact layer (240) to the surface of the solar cell substrate (210) through a portion of the burn through layer (230) and the coating (220).

Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

DOE Office of Scientific and Technical Information (OSTI.GOV)

Field, Ella; Bellum, John; Kletecka, Damon

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defectmore » density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.« less

Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

DOE PAGES

Field, Ella; Bellum, John; Kletecka, Damon

2014-11-06

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defectmore » density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.« less

MgF2 monolayer as an anti-reflecting material

NASA Astrophysics Data System (ADS)

Mahida, H. R.; Singh, Deobrat; Sonvane, Yogesh; Gupta, Sanjeev K.; Thakor, P. B.

2017-02-01

The single-layer atomic sheet of magnesium fluoride (MgF2) having 1H and 1T phase structure (hexagonal and tetragonal phase) has been calculated by density functional theory (DFT). Further, we have investigated the structural, electronic and optical properties such as frequency dependent dielectric function, absorption spectra, energy loss spectra, reflectivity, refractive index and optical conductivity of monolayer MgF2 for the direction of parallel and perpendicular electric field polarizations. Our results suggest that monolayer MgF2 provides promising applications in anti-reflection coatings, high-reflective systems and in opto-electronic materials.

Method and tool to reverse the charges in anti-reflection films used for solar cell applications

DOEpatents

Sharma, Vivek; Tracy, Clarence

2017-01-31

A method is provided for making a solar cell. The method includes providing a stack including a substrate, a barrier layer disposed on the substrate, and an anti-reflective layer disposed on the barrier layer, where the anti-reflective layer has charge centers. The method also includes generating a corona with a charging tool and contacting the anti-reflective layer with the corona thereby injecting charge into at least some of the charge centers in the anti-reflective layer. Ultra-violet illumination and temperature-based annealing may be used to modify the charge of the anti-reflective layer.

Broadband moth-eye antireflection coatings on silicon

NASA Astrophysics Data System (ADS)

Sun, Chih-Hung; Jiang, Peng; Jiang, Bin

2008-02-01

We report a bioinspired templating technique for fabricating broadband antireflection coatings that mimic antireflective moth eyes. Wafer-scale, subwavelength-structured nipple arrays are directly patterned on silicon using spin-coated silica colloidal monolayers as etching masks. The templated gratings exhibit excellent broadband antireflection properties and the normal-incidence specular reflection matches with the theoretical prediction using a rigorous coupled-wave analysis (RCWA) model. We further demonstrate that two common simulation methods, RCWA and thin-film multilayer models, generate almost identical prediction for the templated nipple arrays. This simple bottom-up technique is compatible with standard microfabrication, promising for reducing the manufacturing cost of crystalline silicon solar cells.

Bioinspired broadband antireflection coatings on GaSb

NASA Astrophysics Data System (ADS)

Min, Wei-Lun; Betancourt, Amaury P.; Jiang, Peng; Jiang, Bin

2008-04-01

We report an inexpensive yet scalable templating technique for fabricating moth-eye antireflection gratings on gallium antimonide substrates. Non-close-packed colloidal monolayers are utilized as etching masks to pattern subwavelength-structured nipple arrays on GaSb. The resulting gratings exhibit superior broadband antireflection properties and thermal stability than conventional multilayer dielectric coatings. The specular reflection of the templated nipple arrays match with the theoretical predictions using a rigorous coupled-wave analysis model. The effect of the nipple shape and size on the antireflection properties has also been investigated by the same model. These biomimetic coatings are of great technological importance in developing efficient thermophotovoltaic cells.

Fabrication of bioinspired nanostructured materials via colloidal self-assembly

NASA Astrophysics Data System (ADS)

Huang, Wei-Han

Through millions of years of evolution, nature creates unique structures and materials that exhibit remarkable performance on mechanicals, opticals, and physical properties. For instance, nacre (mother of pearl), bone and tooth show excellent combination of strong minerals and elastic proteins as reinforced materials. Structured butterfly's wing and moth's eye can selectively reflect light or absorb light without dyes. Lotus leaf and cicada's wing are superhydrophobic to prevent water accumulation. The principles of particular biological capabilities, attributed to the highly sophisticated structures with complex hierarchical designs, have been extensively studied. Recently, a large variety of novel materials have been enabled by natural-inspired designs and nanotechnologies. These advanced materials will have huge impact on practical applications. We have utilized bottom-up approaches to fabricate nacre-like nanocomposites with "brick and mortar" structures. First, we used self-assembly processes, including convective self-assembly, dip-coating, and electrophoretic deposition to form well oriented layer structure of synthesized gibbsite (aluminum hydroxide) nanoplatelets. Low viscous monomer was permeated into layered nanoplatelets and followed by photo-curing. Gibbsite-polymer composite displays 2 times higher tensile strength and 3 times higher modulus when compared with pure polymer. More improvement occurred when surface-modified gibbsite platelets were cross-linked with the polymer matrix. We observed ˜4 times higher strength and nearly 1 order of magnitude higher modulus than pure polymer. To further improve the mechanical strength and toughness of inorganicorganic nanocomposites, we exploited ultrastrong graphene oxide (GO), a single atom thick hexagonal carbon sheet with pendant oxidation groups. GO nanocomposite is made by co-filtrating GO/polyvinyl alcohol suspension on 0.2 im pore-sized membrane. It shows ˜2 times higher strength and ˜15 times higher ultimate strains than nacre and pure GO paper (also synthesized by filtration). Specifically, it exhibits ˜30 times higher fracture energy than filtrated graphene paper and nacre, ˜100 times tougher than filtrated GO paper. Besides reinforced nanocomposites, we further explored the self-assembly of spherical colloids and the templating nanofabrication of moth-eye-inspired broadband antireflection coatings. Binary crystalline structures can be easily accomplished by spin-coating double-layer nonclose-packed colloidal crystals as templates, followed by colloidal templating. The polymer matrix between self-assembled colloidal crystal has been used as a sacrificial template to define the resulting periodic binary nanostructures, including intercalated arrays of silica spheres and polymer posts, gold nanohole arrays with binary sizes, and dimple-nipple antireflection coatings. The binary-structured antireflection coatings exhibit better antireflective properties than unitary coatings. Natural optical structures and nanocomposites teach us a great deal on how to create high performance artificial materials. The bottom-up technologies developed in this thesis are scalable and compatible with standard industrial processes, promising for manufacturing high-performance materials for the benefits of human beings.

Compact Radiative Control Structures for Millimeter Astronomy

NASA Technical Reports Server (NTRS)

Brown, Ari D.; Chuss, David T.; Chervenak, James A.; Henry, Ross M.; Moseley, s. Harvey; Wollack, Edward J.

2010-01-01

We have designed, fabricated, and tested compact radiative control structures, including antireflection coatings and resonant absorbers, for millimeter through submillimeter wave astronomy. The antireflection coatings consist of micromachined single crystal silicon dielectric sub-wavelength honeycombs. The effective dielectric constant of the structures is set by the honeycomb cell geometry. The resonant absorbers consist of pieces of solid single crystal silicon substrate and thin phosphorus implanted regions whose sheet resistance is tailored to maximize absorption by the structure. We present an implantation model that can be used to predict the ion energy and dose required for obtaining a target implant layer sheet resistance. A neutral density filter, a hybrid of a silicon dielectric honeycomb with an implanted region, has also been fabricated with this basic approach. These radiative control structures are scalable and compatible for use large focal plane detector arrays.

Sol-gel preparation of self-cleaning SiO2-TiO2/SiO2-TiO2 double-layer antireflective coating for solar glass

NASA Astrophysics Data System (ADS)

Lin, Wensheng; Zheng, Jiaxian; Yan, Lianghong; Zhang, Xinxiang

2018-03-01

Self-cleaning SiO2-TiO2/SiO2-TiO2 double-layer antireflective (AR) coating is prepared by sol-gel process. SiO2 sol is prepared by using tetraethyl orthosilicate (TEOS) as precursor and ammonia as catalyst, while TiO2 sol was prepared by using tetrabutyl orthotitanate (TBOT) as precursor and hydrochloric acid as catalyst. The effect of TiO2 content on refractive index, abrasion-resistance and photo-catalytic activity of SiO2-TiO2 hybrid thin films or powders is systematically investigated. It is found that the refractive index of SiO2-TiO2 hybrid thin films increases gradually from 1.18 to 1.53 as the weight ratio of TiO2 to SiO2 increased from 0 to 1.0. The SiO2-TiO2 hybrid thin film and powder possesses good abrasion-resistance and photo-catalytic activity, respectively, as the weight ratio of TiO2 to SiO2 is 0.4. The degradation degree of Rhodamine B by SiO2-TiO2 hybrid powder is 88.3%. Finally, SiO2-TiO2/SiO2-TiO2 double-layer AR coating with high transmittance, abrasion-resistance and self-cleaning property is realized.

Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography

PubMed Central

Burghoorn, Marieke; Roosen-Melsen, Dorrit; de Riet, Joris; Sabik, Sami; Vroon, Zeger; Yakimets, Iryna; Buskens, Pascal

2013-01-01

Anti-reflective coatings (ARCs) are used to lower the reflection of light on the surface of a substrate. Here, we demonstrate that the two main drawbacks of moth eye-structured ARCs—i.e., the lack of suitable coating materials and a process for large area, high volume applications—can be largely eliminated, paving the way for cost-efficient and large-scale production of durable moth eye-structured ARCs on polymer substrates. We prepared moth eye coatings on polymethylmethacrylate (PMMA) and polycarbonate using wafer-by-wafer step-and-flash nano-imprint lithography (NIL). The reduction in reflection in the visible field achieved with these coatings was 3.5% and 4.0%, respectively. The adhesion of the coating to both substrates was good. The moth eye coating on PMMA demonstrated good performance in three prototypical accelerated ageing tests. The pencil hardness of the moth eye coatings on both substrates was <4B, which is less than required for most applications and needs further optimization. Additionally, we developed a roll-to-roll UV NIL pilot scale process and produced moth eye coatings on polyethylene terephthalate (PET) at line speeds up to two meters per minute. The resulting coatings showed a good replication of the moth eye structures and, consequently, a lowering in reflection of the coated PET of 3.0%. PMID:28788301

Sol-gel antireflective coating on plastics

DOEpatents

Ashley, C.S.; Reed, S.T.

1988-01-26

An antireflection film made from reliquified sol-gel hydrolyzation, condensation polymeric reaction product of a silicon, alkoxides and/or metal alkoxides, or mixtures thereof. The film is particularly useful for coating plastics.

Large-aperture Wide-bandwidth Antireflection-coated Silicon Lenses for Millimeter Wavelengths

NASA Technical Reports Server (NTRS)

Datta, R.; Munson, C. D.; Niemack, M. D.; McMahon, J. J.; Britton, J.; Wollack, Edward J.; Beall, J.; Devlin, M. J.; Fowler, J.; Gallardo, P.;

Sol-gel antireflective coating on plastics

DOEpatents

Ashley, Carol S.; Reed, Scott T.

1990-01-01

An antireflection film made from a reliquified sol-gel hydrolyzation, condensation polymeric reaction product of a silicon, alkoxides and/or metal alkoxides, or mixtures thereof. The film is particularly useful for coating plastics.

Effect of sol aging time on the anti-reflective properties of silica coatings templated with phosphoric acid

NASA Astrophysics Data System (ADS)

Wen, Wen; Li, Haibin; Chen, Xiaojing; Chang, Chengkang

Silica anti-reflective coatings have been prepared by a sol-gel dip-coating process using the sol containing phosphoric acid as a pore-forming template. The effect of the aging time of the sol on the anti-reflective properties has been investigated. The surface topography of the silica AR coatings has been characterized. With increasing sol aging time, more over-sized pores larger than 100 nm are formed in the silica coatings. These could act as scattering centers, scattering visible light and thereby lowering transmittance. The optimal aging time was identified as 1 day, and the corresponding silica coatings showed a maximum transmittance of 99.2%, representing an 8% increase compared to the bare glass substrate.

Monolithic graded-refractive-index glass-based antireflective coatings. Broadband/omnidirectional light harvesting and self-cleaning characteristics

DOE PAGES

Aytug, Tolga; Lupini, Andrew R.; Jellison, Gerald E.; ...

2015-04-23

The design of multifunctional coatings impact impact the performance of many optical systems and components. Such coatings should be mechanically robust, and combine user-defined optical and wetting functions with scalable fabrication formulations. By taking cues from the properties of some natural biological structures, we report here the formation of low-refractive index antireflective glass films that embody omni-directional optical properties over a wide range of wavelengths, while also possessing specific wetting capabilities. The coatings comprise an interconnected network of nanoscale pores surrounded by a nanostructured silica framework. These structures result from a novel fabrication method that utilizes metastable spinodal phase separationmore » in glass-based materials. The approach not only enables design of surface microstructures with graded-index antireflection characteristics, where the surface reflection is suppressed through optical impedance matching between interfaces, but also facilitates self-cleaning ability through modification of the surface chemistry. Based on near complete elimination of Fresnel reflections (yielding >95% transmission through a single-side coated glass) and corresponding increase in broadband transmission, the fabricated nanostructured surfaces are found to promote a general and an invaluable ~3–7% relative increase in current output of multiple direct/indirect bandgap photovoltaic cells. Moreover, these antireflective surfaces also demonstrate superior resistance against mechanical wear and abrasion. Unlike conventional counterparts, the present antireflective coatings are essentially monolithic, enabling simultaneous realization of graded index anti-reflectivity, self-cleaning capability, and mechanical stability within the same surface. Moreover, the concept represents a fundamental basis for development of advanced coated optical quality products, especially where environmental exposure is required.« less

Thin film solar energy collector

DOEpatents

Aykan, Kamran; Farrauto, Robert J.; Jefferson, Clinton F.; Lanam, Richard D.

1983-11-22

A multi-layer solar energy collector of improved stability comprising: (1) a substrate of quartz, silicate glass, stainless steel or aluminum-containing ferritic alloy; (2) a solar absorptive layer comprising silver, copper oxide, rhodium/rhodium oxide and 0-15% by weight of platinum; (3) an interlayer comprising silver or silver/platinum; and (4) an optional external anti-reflective coating, plus a method for preparing a thermally stable multi-layered solar collector, in which the absorptive layer is undercoated with a thin film of silver or silver/platinum to obtain an improved conductor-dielectric tandem.

Glass-Si heterojunction solar cells

NASA Technical Reports Server (NTRS)

Anderson, R. L.

1975-01-01

Experimental studies and models for In2O3/Si and SnO2/N-Si solar cells are considered for their suitability in terrestrial applications. The silicon is the active material, and the glass serves as the window to solar radiation, an antireflection coating of the Si, and a low resistance contact. Results show that amorphous windows or layers suppress photocurrent. The interfacial SiO2 layer suppresses photocurrent and increases series resistance. Suppression increases with illumination.

Optical enhancing durable anti-reflective coating

DOEpatents

Maghsoodi, Sina; Varadarajan, Aravamuthan; Movassat, Meisam

2016-07-05

Disclosed herein are polysilsesquioxane based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In embodiments, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in the polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, Si--OH condensation catalyst and/or nanofillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes including flow coating and roll coating, and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

Selective dry etching of silicon containing anti-reflective coating

NASA Astrophysics Data System (ADS)

Sridhar, Shyam; Nolan, Andrew; Wang, Li; Karakas, Erdinc; Voronin, Sergey; Biolsi, Peter; Ranjan, Alok

2018-03-01

Multi-layer patterning schemes involve the use of Silicon containing Anti-Reflective Coating (SiARC) films for their anti-reflective properties. Patterning transfer completion requires complete and selective removal of SiARC which is very difficult due to its high silicon content (>40%). Typically, SiARC removal is accomplished through a non-selective etch during the pattern transfer process using fluorine containing plasmas, or an ex-situ wet etch process using hydrofluoric acid is employed to remove the residual SiARC, post pattern transfer. Using a non-selective etch may result in profile distortion or wiggling, due to distortion of the underlying organic layer. The drawbacks of using wet etch process for SiARC removal are increased overall processing time and the need for additional equipment. Many applications may involve patterning of active structures in a poly-Si layer with an underlying oxide stopping layer. In such applications, SiARC removal selective to oxide using a wet process may prove futile. Removing SiARC selectively to SiO2 using a dry etch process is also challenging, due to similarity in the nature of chemical bonds (Si - O) in the two materials. In this work, we present highly selective etching of SiARC, in a plasma driven by a surface wave radial line slot antenna. The first step in the process involves an in-situ modification of the SiARC layer in O2 plasma followed by selective etching in a NF3/H2 plasma. Surface treatment in O2 plasma resulted in enhanced etching of the SiARC layer. For the right processing conditions, in-situ NF3/H2 dry etch process demonstrated selectivity values greater than 15:1 with respect to SiO2. The etching chemistry, however, was sensitive to NF3:H2 gas ratio. For dilute NF3 in H2, no SiARC etching was observed. Presumably, this is due to the deposition of ammonium fluorosilicate layer that occurs for dilute NF3/H2 plasmas. Additionally, challenges involved in selective SiARC removal (selective to SiO2, organic and Si layers) post pattern transfer, in a multi-layer structure will be discussed.

Self-assembled nanolaminate coatings (SV)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fan, H.

2012-03-01

Sandia National Laboratories (Sandia) and Lockheed Martin Aeronautics (LM Aero) are collaborating to develop affordable, self-assembled, nanocomposite coatings and associated fabrication processes that will be tailored to Lockheed Martin product requirements. The purpose of this project is to develop a family of self-assembled coatings with properties tailored to specific performance requirements, such as antireflective (AR) optics, using Sandia-developed self-assembled techniques. The project met its objectives by development of a simple and economic self-assembly processes to fabricate multifunctional coatings. Specifically, materials, functionalization methods, and associated coating processes for single layer and multiple layers coatings have been developed to accomplish high reflectivemore » coatings, hydrophobic coatings, and anti-reflective coatings. Associated modeling and simulations have been developed to guide the coating designs for optimum optical performance. The accomplishments result in significant advantages of reduced costs, increased manufacturing freedom/producibility, improved logistics, and the incorporation of new technology solutions not possible with conventional technologies. These self-assembled coatings with tailored properties will significantly address LMC's needs and give LMC a significant competitive lead in new engineered materials. This work complements SNL's LDRD and BES programs aimed at developing multifunctional nanomaterials for microelectronics and optics as well as structure/property investigations of self-assembled nanomaterials. In addition, this project will provide SNL with new opportunities to develop and apply self-assembled nanocomposite optical coatings for use in the wavelength ranges of 3-5 and 8-12 micrometers, ranges of vital importance to military-based sensors and weapons. The SANC technologies will be applied to multiple programs within the LM Company including the F-35, F-22, ADP (Future Strike Bomber, UAV, UCAV, etc.). The SANC technologies will establish LMA and related US manufacturing capability for commercial and military applications therefore reducing reliance on off-shore development and production of related critical technologies. If these technologies are successfully licensed, production of these coatings in manufactory will create significant technical employment opportunities.« less

Anti-reflective and anti-soiling coatings with self-cleaning properties

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nair, Vinod; Brophy, Brenor L.

Disclosed herein is a coated glass element including a glass component and a coating adhered to the glass component through siloxane linkages, the coating having at least one of an anti-reflective property, a high abrasion resistance property and a hydrophobic property, wherein the coating comprises a dried gel formed from at least one hydrolyzed alkoxysilane-based sol and at least one hydrolyzed organosilane-based sol.

Buried nanoantenna arrays: versatile antireflection coating.

PubMed

Kabiri, Ali; Girgis, Emad; Capasso, Federico

2013-01-01

Reflection is usually a detrimental phenomenon in many applications such as flat-panel-displays, solar cells, photodetectors, infrared sensors, and lenses. Thus far, to control and suppress the reflection from a substrate, numerous techniques including dielectric interference coatings, surface texturing, adiabatic index matching, and scattering from plasmonic nanoparticles have been investigated. A new technique is demonstrated to manage and suppress reflection from lossless and lossy substrates. It provides a wider flexibility in design versus previous methods. Reflection from a surface can be suppressed over a narrowband, wideband, or multiband frequency range. The antireflection can be dependent or independent of the incident wave polarization. Moreover, antireflection at a very wide incidence angle can be attained. The reflection from a substrate is controlled by a buried nanoantenna array, a structure composed of (1) a subwavelength metallic array and (2) a dielectric cover layer referred to as a superstrate. The material properties and thickness of the superstrate and nanoantennas' geometry and periodicity control the phase and intensity of the wave circulating inside the superstrate cavity. A minimum reflectance of 0.02% is achieved in various experiments in the mid-infrared from a silicon substrate. The design can be integrated in straightforward way in optical devices. The proposed structure is a versatile AR coating to optically impedance matches any substrate to free space in selected any narrow and broadband spectral response across the entire visible and infrared spectrum.

Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2 -Si3N4.

PubMed

Hernández-Pinilla, D; Rodríguez-Palomo, A; Álvarez-Fraga, L; Céspedes, E; Prieto, J E; Muñoz-Martín, A; Prieto, C

2016-06-01

Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2-Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating-cooling cycles are shown here.

Optical coatings for high average power XeF lasers

NASA Astrophysics Data System (ADS)

Milam, D.; Thomas, I.; Wilder, J.; George, D.

1988-03-01

Porous silica, calcium and magnesium fluorides were investigated for potential use as antireflective coatings for XeF lasers. Excellent optical properties were obtained for all types, and laser damage thresholds were in the range 18 to 25 J/sq cm at 350 nm for 25 ns pulses at 25 Hz pulse repetition frequency. Studies of the effects of the XeF laser environment on these coatings were incomplete. Three oxides, ZrO2, HfO2, and Ta2O5 were investigated as the high index components to be paired with low index porous SiO2 for highly reflective dielectric coatings. Single oxide layers had indices in the 1.7 to 1.8 range and HfO2 coatings had the highest damage threshold at about 5 J/sq cm. An unexpected problem arose on attempts to prepare multilayer coatings. Stress in the coating after 6 to 8 layers had been put down, gave rise to crazing and peeling. This could not be avoided even on extending the curing process between coats.

Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography

NASA Astrophysics Data System (ADS)

Nakajima, Makoto; Sakaguchi, Takahiro; Hashimoto, Keisuke; Sakamoto, Rikimaru; Kishioka, Takahiro; Takei, Satoshi; Enomoto, Tomoyuki; Nakajima, Yasuyuki

2006-03-01

Integrated circuit manufacturers are consistently seeking to minimize device feature dimensions in order to reduce chip size and increase integration level. Feature sizes on chips are achieved sub 65nm with the advanced 193nm microlithography process. R&D activities of 45nm process have been started so far, and 193nm lithography is used for this technology. The key parameters for this lithography process are NA of exposure tool, resolution capability of resist, and reflectivity control with bottom anti-reflective coating (BARC). In the point of etching process, single-layer resist process can't be applied because resist thickness is too thin for getting suitable aspect ratio. Therefore, it is necessary to design novel BARC system and develop hard mask materials having high etching selectivity. This system and these materials can be used for 45nm generation lithography. Nissan Chemical Industries, Ltd. and Brewer Science, Inc. have been designed and developed the advanced BARCs for the above propose. In order to satisfy our target, we have developed novel BARC and hard mask materials. We investigated the multi-layer resist process stacked 4 layers (resist / thin BARC / silicon-contained BARC (Si-ARC) / spin on carbon hard mask (SOC)) (4 layers process). 4 layers process showed the excellent lithographic performance and pattern transfer performance. In this paper, we will discuss the detail of our approach and materials for 4 layers process.

A comparative study on omnidirectional anti-reflection SiO2 nanostructure films coating by glancing angle deposition

NASA Astrophysics Data System (ADS)

Prachachet, R.; Samransuksamer, B.; Horprathum, M.; Eiamchai, P.; Limwichean, S.; Chananonnawathorn, C.; Lertvanithphol, T.; Muthitamongkol, P.; Boonruang, S.; Buranasiri, P.

2018-02-01

Fabricated omnidirectional anti-reflection nanostructure films as a one of the promising alternative solar cell applications have attracted enormous scientific and industrial research benefits to their broadband, effective over a wide range of incident angles, lithography-free and high-throughput process. Recently, the nanostructure SiO2 film was the most inclusive study on anti-reflection with omnidirectional and broadband characteristics. In this work, the three-dimensional silicon dioxide (SiO2) nanostructured thin film with different morphologies including vertical align, slant, spiral and thin films were fabricated by electron beam evaporation with glancing angle deposition (GLAD) on the glass slide and silicon wafer substrate. The morphological of the prepared samples were characterized by field-emission scanning electron microscope (FE-SEM) and high-resolution transmission electron microscope (HRTEM). The transmission, omnidirectional and birefringence property of the nanostructure SiO2 films were investigated by UV-Vis-NIR spectrophotometer and variable angle spectroscopic ellipsometer (VASE). The spectrophotometer measurement was performed at normal incident angle and a full spectral range of 200 - 2000 nm. The angle dependent transmission measurements were investigated by rotating the specimen, with incidence angle defined relative to the surface normal of the prepared samples. This study demonstrates that the obtained SiO2 nanostructure film coated on glass slide substrate exhibits a higher transmission was 93% at normal incident angle. In addition, transmission measurement in visible wavelength and wide incident angles -80 to 80 were increased in comparison with the SiO2 thin film and glass slide substrate due to the transition in the refractive index profile from air to the nanostructure layer that improve the antireflection characteristics. The results clearly showed the enhanced omnidirectional and broadband characteristic of the three dimensional SiO2 nanostructure film coating.

Impedance spectroscopy of heterojunction solar cell a-SiC/c-Si with ITO antireflection film investigated at different temperatures

NASA Astrophysics Data System (ADS)

Šály, V.; Perný, M.; Janíček, F.; Huran, J.; Mikolášek, M.; Packa, J.

2017-04-01

Progressive smart photovoltaic technologies including heterostructures a-SiC/c-Si with ITO antireflection film are one of the prospective replacements of conventional photovoltaic silicon technology. Our paper is focused on the investigation of heterostructures a-SiC/c-Si provided with a layer of ITO (indium oxide/tin oxide 90/10 wt.%) which acts as a passivating and antireflection coating. Prepared photovoltaic cell structure was investigated at various temperatures and the influence of temperature on its operation was searched. The investigation of the dynamic properties of heterojunction PV cells was carried out using impedance spectroscopy. The equivalent AC circuit which approximates the measured impedance data was proposed. Assessment of the influence of the temperature on the operation of prepared heterostructure was carried out by analysis of the temperature dependence of AC equivalent circuit elements.

Graphene oxide as a p-dopant and an anti-reflection coating layer, in graphene/silicon solar cells

NASA Astrophysics Data System (ADS)

Yavuz, S.; Kuru, C.; Choi, D.; Kargar, A.; Jin, S.; Bandaru, P. R.

2016-03-01

It is shown that coating graphene-silicon (Gr/Si) Schottky junction based solar cells with graphene oxide (GO) improves the power conversion efficiency (PCE) of the cells, while demonstrating unprecedented device stability. The PCE has been shown to be increased to 10.6% (at incident radiation of 100 mW cm-2) for the Gr/Si solar cell with an optimal GO coating thickness compared to 3.6% for a bare/uncoated Gr/Si solar cell. The p-doping of graphene by the GO, which also serves as an antireflection coating (ARC) has been shown to be a main contributing factor to the enhanced PCE. A simple spin coating process has been used to apply GO with thickness commensurate with an anti-refection coating (ARC) and indicates the suitability of the developed methodology for large-scale solar cell assembly.It is shown that coating graphene-silicon (Gr/Si) Schottky junction based solar cells with graphene oxide (GO) improves the power conversion efficiency (PCE) of the cells, while demonstrating unprecedented device stability. The PCE has been shown to be increased to 10.6% (at incident radiation of 100 mW cm-2) for the Gr/Si solar cell with an optimal GO coating thickness compared to 3.6% for a bare/uncoated Gr/Si solar cell. The p-doping of graphene by the GO, which also serves as an antireflection coating (ARC) has been shown to be a main contributing factor to the enhanced PCE. A simple spin coating process has been used to apply GO with thickness commensurate with an anti-refection coating (ARC) and indicates the suitability of the developed methodology for large-scale solar cell assembly. Electronic supplementary information (ESI) available: (i) Experimental methods, (ii) optical images of devices with and without graphene oxide (GO), (iii) comparison of the power conversion efficiency (PCE) due to the GO coating and nitric acid doping, (iv) specular and diffuse reflectance measurements, (v) stability data of pristine graphene/silicon (Gr/Si) solar cells. See DOI: 10.1039/c5nr09143h

High gain durable anti-reflective coating

DOEpatents

Maghsoodi, Sina; Brophy, Brenor L.; Colson, Thomas E.; Gonsalves, Peter R.; Abrams, Ze'ev R.

2016-07-26

Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si--OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

Multilayer Anti-Reflective Coating Development for PMMA Fresnel Lenses

DTIC Science & Technology

2010-06-07

been sputter deposited on UV transparent polymethylmethacrylate (UVT-PMMA) windows. The amorphous coatings are deposited using reactive sputtering in a...SUBJECT TERMS Anti-reflective coatings, Fresnel lens, polymethylmethacrylate , PMMA 16. SECURITY CLASSIFICATION OF: 17. LIMITATION OF ABSTRACT 18...high quality dielectric materials deposited on a variety of substrates including polymethylmethacrylate (PMMA)  Highly amorphous films achieved

Nano-cones for broadband light coupling to high index substrates

NASA Astrophysics Data System (ADS)

Buencuerpo, J.; Torné, L.; Álvaro, R.; Llorens, J. M.; Dotor, M. L.; Ripalda, J. M.

2016-12-01

The moth-eye structure has been proposed several times as an antireflective coating to replace the standard optical thin films. Here, we experimentally demonstrate the feasibility of a dielectric moth-eye structure as an antireflective coating for high-index substrates, like GaAs. The fabricated photonic crystal has Si3N4 cones in a square lattice, sitting on top of a TiO2 index matching layer. This structure attains 1.4% of reflectance power losses in the operation spectral range of GaAs solar cells (440-870 nm), a 12.5% relative reduction of reflection power losses in comparison with a standard bilayer. The work presented here considers a fabrication process based on laser interference lithography and dry etching, which are compatible with solar cell devices. The experimental results are consistent with scattering matrix simulations of the fabricated structures. In a broader spectral range (400-1800 nm), the simulation estimates that the nanostructure also significantly outperforms the standard bilayer coating (3.1% vs. 4.5% reflection losses), a result of interest for multijunction tandem solar cells.

Anti-reflective and anti-soiling coatings for self-cleaning properties

DOE Office of Scientific and Technical Information (OSTI.GOV)

Brophy, Brenor L.; Nair, Vinod; Dave, Bakul Champaklal

The disclosure discloses abrasion resistant, persistently hydrophobic and oleophobic, anti-reflective and anti-soiling coatings for glass. The coatings described herein have wide application, including for example the front cover glass of solar modules. Methods of applying the coatings using various apparatus are disclosed. Methods for using the coatings in solar energy generation plants to achieve greater energy yield and reduced operations costs are disclosed. Coating materials are formed by combinations of hydrolyzed silane-base precursors through sol-gel processes. Several methods of synthesis and formulation of coating materials are disclosed.

Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

PubMed Central

2009-01-01

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen. PMID:20596409

Improved HgCdTe detectors with novel antireflection coating

NASA Astrophysics Data System (ADS)

Babu, Sachi R.; Hu, Kelley; Manthripragada, Sridhar; Martineau, Robert J.; Kotecki, C. A.; Peters, F. A.; Burgess, A. S.; Krebs, Danny J.; Mott, David B.; Ewin, Audrey J.; Miles, A.; Nguyen, Trang L.; Shu, Peter K.

1996-10-01

The composite infrared spctrometer (CIRS) is an important instrument for the upcoming Cassini mission for sensing infrared (IR) radiation from the Saturanian planetary system. We have delivered a linear, ten element, mercury cadmium telluride (HgCdTe) photoconductive detector array for use on focal plane 3 (FP3), which is responsible for detecting radiation from the 9.1 micrometer to 16.6 micrometer wavelength range. Reliable HgCdTe detectors require robust passivation, a low-stress zinc sulfide (ZnS) anti-reflection (AR) coating with good adhesion, and a proper optical cavity design to smooth out the resonance in the detector spectral response. During the development of CIRS flight array, we have demonstrated the potential of using an in-situ interfacial layer, such as SiN(subscript x), between ZnS and the anodic oxide. Such an interfacial layer drastically improves the adhesion between the ZnS and oxide, without degrading the minority carrier lifetime. We have also demonstrated the feasibility of applying a SiN(subscript x) 'rain coat' layer over the ZnS to prevent moisture and other chemicals from attacking the AR coating, thus improving the long term reliability. This also enables device operation in a hazardous environment. The alumina/epoxy/HgCdTe/oxide/ZnS structure is a complicated multi-cavity optical system. We have developed an extensive device simulation, which enables us to make the optimal choice of individual cavity thickness for minimizing the resonance and maximizing the quantum efficiency. We have also used 0.05 micrometer alumina powder loaded epoxy to minimize the reflections at the epoxy/HgCdTe interface, thus minimizing the resonance.

Efficient Colorful Perovskite Solar Cells Using a Top Polymer Electrode Simultaneously as Spectrally Selective Antireflection Coating.

PubMed

Jiang, Youyu; Luo, Bangwu; Jiang, Fangyuan; Jiang, Fuben; Fuentes-Hernandez, Canek; Liu, Tiefeng; Mao, Lin; Xiong, Sixing; Li, Zaifang; Wang, Tao; Kippelen, Bernard; Zhou, Yinhua

2016-12-14

Organometal halide perovskites have shown excellent optoelectronic properties and have been used to demonstrate a variety of semiconductor devices. Colorful solar cells are desirable for photovoltaic integration in buildings and other aesthetically appealing applications. However, the realization of colorful perovskite solar cells is challenging because of their broad and large absorption coefficient that commonly leads to cells with dark-brown colors. Herein, for the first time, we report a simple and efficient strategy to achieve colorful perovskite solar cells by using the transparent conducting polymer (poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate), PEDOT:PSS) as a top electrode and simultaneously as an spectrally selective antireflection coating. Vivid colors across the visible spectrum are attained by engineering optical interference effects among the transparent PEDOT:PSS polymer electrode, the hole-transporting layer and the perovskite layer. The colored perovskite solar cells display power conversion efficiency values from 12.8 to 15.1% (from red to blue) when illuminated from the FTO glass side and from 11.6 to 13.8% (from red to blue) when illuminated from the PEDOT:PSS side. The new approach provides an advanced solution for fabricating colorful perovskite solar cells with easy processing and high efficiency.

Antireflection Coatings for Silicon in the 2.5-50-microm Region.

PubMed

Sherman, G H; Coleman, P D

1971-12-01

It has been found that vacuum-deposited films of CsI, AgCl, TlBr, and TlCl are useful as antireflection coatings for silicon over a broad spectral range in the infrared. Measurements performed on a plane-parallel silicon plate coated with various thicknesses of the above materials yield transmittance values ranging from 99% at lambda = 2.9 microm to 88% at lambda = 27 microm. Experimental details of the coating process and properties of the coatings are discussed.

Antireflective coatings with adjustable refractive index and porosity synthesized by micelle-templated deposition of MgF2 sol particles.

PubMed

Bernsmeier, Denis; Polte, Jörg; Ortel, Erik; Krahl, Thoralf; Kemnitz, Erhard; Kraehnert, Ralph

2014-11-26

Minimizing efficiency losses caused by unwanted light reflection at the interface between lenses, optical instruments and solar cells with the surrounding medium requires antireflective coatings with adequate refractive index and coating thickness. We describe a new type of antireflective coating material with easily and independently tailorable refractive index and coating thickness based on the deposition of colloidal MgF2 nanoparticles. The material synthesis employs micelles of amphiphilic block copolymers as structure directing agent to introduce controlled mesoporosity into MgF2 film. The coatings thickness can be easily adjusted by the applied coating conditions. The coatings refractive index is determined by the materials porosity, which is controlled by the amount of employed pore template. The refractive index can be precisely tuned between 1.23 and 1.11, i.e., in a range that is not accessible to nonporous inorganic materials. Hence, zero reflectance conditions can be established for a wide range of substrate materials.

Apparatus and method of manufacture for depositing a composite anti-reflection layer on a silicon surface

NASA Technical Reports Server (NTRS)

Pain, Bedabrata (Inventor)

2012-01-01

An apparatus and associated method are provided. A first silicon layer having at least one of an associated passivation layer and barrier is included. Also included is a composite anti-reflection layer including a stack of layers each with a different thickness and refractive index. Such composite anti-reflection layer is disposed adjacent to the first silicon layer.

Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2–Si3N4

PubMed Central

Hernández-Pinilla, D.; Rodríguez-Palomo, A.; Álvarez-Fraga, L.; Céspedes, E.; Prieto, J.E.; Muñoz-Martín, A.; Prieto, C.

2016-01-01

Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2–Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating–cooling cycles are shown here. PMID:27182544

Solar thermophotovoltaic system using nanostructures.

PubMed

Ungaro, Craig; Gray, Stephen K; Gupta, Mool C

2015-09-21

This paper presents results on a highly efficient experimental solar thermophotovoltaic (STPV) system using simulated solar energy. An overall power conversion efficiency of 6.2% was recorded under solar simulation. This was matched with a thermodynamic model, and the losses within the system, as well as a path forward to mitigate these losses, have been investigated. The system consists of a planar, tungsten absorbing/emitting structure with an anti-reflection layer coated laser-microtextured absorbing surface and single-layer dielectric coated emitting surface. A GaSb PV cell was used to capture the emitted radiation and convert it into electrical energy. This simple structure is both easy to fabricate and temperature stable, and contains no moving parts or heat exchange fluids.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aytug, Tolga; Lupini, Andrew R.; Jellison, Gerald E.

The design of multifunctional coatings impact impact the performance of many optical systems and components. Such coatings should be mechanically robust, and combine user-defined optical and wetting functions with scalable fabrication formulations. By taking cues from the properties of some natural biological structures, we report here the formation of low-refractive index antireflective glass films that embody omni-directional optical properties over a wide range of wavelengths, while also possessing specific wetting capabilities. The coatings comprise an interconnected network of nanoscale pores surrounded by a nanostructured silica framework. These structures result from a novel fabrication method that utilizes metastable spinodal phase separationmore » in glass-based materials. The approach not only enables design of surface microstructures with graded-index antireflection characteristics, where the surface reflection is suppressed through optical impedance matching between interfaces, but also facilitates self-cleaning ability through modification of the surface chemistry. Based on near complete elimination of Fresnel reflections (yielding >95% transmission through a single-side coated glass) and corresponding increase in broadband transmission, the fabricated nanostructured surfaces are found to promote a general and an invaluable ~3–7% relative increase in current output of multiple direct/indirect bandgap photovoltaic cells. Moreover, these antireflective surfaces also demonstrate superior resistance against mechanical wear and abrasion. Unlike conventional counterparts, the present antireflective coatings are essentially monolithic, enabling simultaneous realization of graded index anti-reflectivity, self-cleaning capability, and mechanical stability within the same surface. Moreover, the concept represents a fundamental basis for development of advanced coated optical quality products, especially where environmental exposure is required.« less

Cicada-Wing-Inspired Self-Cleaning Antireflection Coatings on Polymer Substrates.

PubMed

Chen, Ying-Chu; Huang, Zhe-Sheng; Yang, Hongta

2015-11-18

The cicada has transparent wings with remarkable self-cleaning properties and high transmittance over the whole visible spectral range, which is derived from periodic conical structures covering the wing surface. Here we report a scalable self-assembly technique for fabricating multifunctional optical coatings that mimic cicada-wing structures. Spin-coated two-dimensional non-close-packed colloidal crystals are utilized as etching masks to pattern subwavelength-structured cone arrays directly on polymer substrates. The resulting gratings exhibit broadband antireflection performance and superhydrophobic properties after surface modification. The dependence of the cone shape and size on the antireflective and self-cleaning properties has also been investigated in this study.

Anti-reflective coating for visible light using a silver nanodisc metasurface with a refractive index of less than 1.0

NASA Astrophysics Data System (ADS)

Yasuda, Hideki; Matsuno, Ryo; Koito, Naoki; Hosoda, Hidemasa; Tani, Takeharu; Naya, Masayuki

2017-12-01

Suppression of visible-light reflection from material surfaces is an important technology for many applications such as flat-panel displays, camera lenses, and solar panels. In this study, we developed an anti-reflective coating design based on a silver nanodisc metasurface. The effective refractive index of a 10-nm-thick monolayer of silver nanodiscs was less than 1.0, which enabled strong suppression of reflection from the underlying substrate. The nanodisc structure was easy to fabricate using a conventional roll-to-roll wet-coating method. The anti-reflective structure was fabricated over a large area.

One-step microwave plasma enhanced chemical vapor deposition (MW-PECVD) for transparent superhydrophobic surface

NASA Astrophysics Data System (ADS)

Thongrom, Sukrit; Tirawanichakul, Yutthana; Munsit, Nantakan; Deangngam, Chalongrat

2018-02-01

We demonstrate a rapid and environmental friendly fabrication technique to produce optically clear superhydrophobic surfaces using poly (dimethylsiloxane) (PDMS) as a sole coating material. The inert PDMS chain is transformed into a 3-D irregular solid network through microwave plasma enhanced chemical vapor deposition (MW-PECVD) process. Thanks to high electron density in the microwave-activated plasma, coating can be done in just a single step with rapid deposition rate, typically much shorter than 10 s. Deposited layers show excellent superhydrophobic properties with water contact angles of ∼170° and roll-off angles as small as ∼3°. The plasma-deposited films can be ultrathin with thicknesses under 400 nm, greatly diminishing the optical loss. Moreover, with appropriate coating conditions, the coating layer can even enhance the transmission over the entire visible spectrum due to a partial anti-reflection effect.

The Broadband Anti-reflection Coated Extended Hemispherical Silicon Lenses for Polarbear-2 Experiment

NASA Astrophysics Data System (ADS)

Siritanasak, P.; Aleman, C.; Arnold, K.; Cukierman, A.; Hazumi, M.; Kazemzadeh, K.; Keating, B.; Matsumura, T.; Lee, A. T.; Lee, C.; Quealy, E.; Rosen, D.; Stebor, N.; Suzuki, A.

2016-08-01

Polarbear-2 (PB-2) is a next-generation receiver that is part of the Simons Array cosmic microwave background (CMB) polarization experiment which is located in the Atacama desert in Northern Chile. The primary scientific goals of the Simons Array are a deep search for the CMB B-mode signature of gravitational waves from inflation and the characterization of large-scale structure using its effect on CMB polarization. The PB-2 receiver will deploy with 1897 dual-polarization sinuous antenna-coupled pixels, each with a directly contacting extended hemispherical silicon lens. Every pixel has dual polarization sensitivity in two spectral bands centered at 95 and 150 GHz, for a total of 7588 transition edge sensor bolometers operating at 270 mK. To achieve the PB-2 detector requirements, we developed a broadband anti-reflection (AR) coating for the extended hemispherical lenses that uses two molds to apply two layers of epoxy, Stycast 1090 and Stycast 2850FT. Our measurements of the absorption loss from the AR coating on a flat surface at cryogenic temperatures show less than 1 % absorption, and the coating has survived multiple thermal cycles. We can control the diameter of the coating within 25 {\\upmu }m and translation errors are within 25 {\\upmu }m in all directions, which results in less than 1 % decrease in transmittance. We also find the performance of the AR-coated lens matches very well with simulations.

Sol-gel preparation of hydrophobic silica antireflective coatings with low refractive index by base/acid two-step catalysis.

PubMed

Cai, Shuang; Zhang, Yulu; Zhang, Hongli; Yan, Hongwei; Lv, Haibing; Jiang, Bo

2014-07-23

Hydrophobic antireflective coatings with a low refractive index were prepared via a base/acid-catalyzed two-step sol-gel process using tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) as precursors, respectively. The base-catalyzed hydrolysis of TEOS leads to the formation of a sol with spherical silica particles in the first step. In the second step, the acid-catalyzed MTES hydrolysis and condensation occur at the surface of the initial base-catalyzed spherical silica particles, which enlarge the silica particle size from 12.9 to 35.0 nm. By a dip-coating process, this hybrid sol gives an antireflective coating with a refractive index of about 1.15. Moreover, the water contact angles of the resulted coatings increase from 22.4 to 108.7° with the increases of MTES content, which affords the coatings an excellent hydrophobicity. A "core-shell" particle growth mechanism of the hybrid sol was proposed and the relationship between the microstructure of silica sols and the properties of AR coatings was investigated.

High gain durable anti-reflective coating

DOE Office of Scientific and Technical Information (OSTI.GOV)

Maghsoodi, Sina; Brophy, Brenor L.; Colson, Thomas E.

Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers,more » Si--OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.« less

Self-assembled antireflection coatings for light trapping based on SiGe random metasurfaces

NASA Astrophysics Data System (ADS)

Bouabdellaoui, Mohammed; Checcucci, Simona; Wood, Thomas; Naffouti, Meher; Sena, Robert Paria; Liu, Kailang; Ruiz, Carmen M.; Duche, David; le Rouzo, Judikael; Escoubas, Ludovic; Berginc, Gerard; Bonod, Nicolas; Zazoui, Mimoun; Favre, Luc; Metayer, Leo; Ronda, Antoine; Berbezier, Isabelle; Grosso, David; Gurioli, Massimo; Abbarchi, Marco

2018-03-01

We demonstrate a simple self-assembly method based on solid state dewetting of ultrathin silicon films and germanium deposition for the fabrication of efficient antireflection coatings on silicon for light trapping. We fabricate SiGe islands with a high surface density, randomly positioned and broadly varied in size. This allows one to reduce the reflectance to low values in a broad spectral range (from 500 nm to 2500 nm) and a broad angle (up to 55°) and to trap within the wafer a large portion of the impinging light (˜40 % ) also below the band gap, where the Si substrate is nonabsorbing. Theoretical simulations agree with the experimental results, showing that the efficient light coupling into the substrate is mediated by Mie resonances formed within the SiGe islands. This lithography-free method can be implemented on arbitrarily thick or thin SiO2 layers and its duration only depends on the sample thickness and on the annealing temperature.

Quantitative adhesion characterization of antireflective coatings in multijunction photovoltaics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Brock, Ryan; Rewari, Raunaq; Novoa, Fernando D.

We discuss the development of a new composite dual cantilever beam (cDCB) thin-film adhesion testing method, which enables the quantitative measurement of adhesion on the thin and fragile substrates used in multijunction photovoltaics. In particular, we address the adhesion of several 2- and 3-layer antireflective coating systems on multijunction cells. By varying interface chemistry and morphology through processing, we demonstrate the marked effects on adhesion and help to develop an understanding of how high adhesion can be achieved, as adhesion values ranging from 0.5 J/m2 to 10 J/m2 were measured. Damp heat (85 degrees C/85% RH) was used to invokemore » degradation of interfacial adhesion. We demonstrate that even with germanium substrates that fracture relatively easily, quantitative measurements of adhesion can be made at high test yield. The cDCB test is discussed as an important new methodology, which can be broadly applied to any system that makes use of thin, brittle, or otherwise fragile substrates.« less

The design of broad band anti-reflection coatings for solar cell applications

NASA Astrophysics Data System (ADS)

Siva Rama Krishna, Angirekula; Sabat, Samrat Lagnajeet; Ghanashyam Krishna, Mamidipudi

2017-01-01

The design of broadband anti-reflection coatings (ARCs) for solar cell applications using multiobjective differential evolutionary (MODE) algorithms is reported. The effect of thickness and refractive index contrast within the layers of the ARC on the bandwidth of reflectance is investigated in detail. In the case of the hybrid plasmonic ARC structures the effect of size, shape and filling fraction of silver (Ag) nanoparticles on the reflectance is studied. Bandwidth is defined as the spectral region of wavelengths over which the reflectance is below 2%. Single, two and three layers ARCs (consisting of MgF2, Al2O3, Si3N4, TiO2 and ZnS or combinations of these materials) were simulated for performance evaluation on an a-Si photovoltaic cell. It is observed that the three layer ARC consisting of MgF2/Si3N4/TiO2(ZnTe) of 81/42/36 nm thicknesses, respectively, exhibited a weighted reflectance of 1.9% with a bandwidth of 450 nm over the wavelength range of 300-900 nm. The ARC bandwidth could be further improved by embedding randomly distributed Ag nanoparticles of size between 100 and 120 nm on a two layer ARC consisting of Al2O3/TiO2 with thickness of 42 nm and 56 nm respectively. This plasmon-dielectric hybrid ARC design exhibited a weighted reflectance of 0.6% with a bandwidth of 560 nm over the wavelength range of 300-900 nm.

Effects of positive ion implantation into antireflection coating of silicon solar cells

NASA Technical Reports Server (NTRS)

Middleton, A. E.; Harpster, J. W.; Collis, W. J.; Kim, C. K.

1971-01-01

The state of technological development of Si solar cells for highest obtained efficiency and radiation resistance is summarized. The various theoretical analyses of Si solar cells are reviewed. It is shown that factors controlling blue response are carrier diffusion length, surface recombination, impurity concentration profile in surface region, high level of surface impurity concentration (degeneracy), reflection coefficient of oxide, and absorption coefficient of Si. The theory of ion implantation of charge into the oxide antireflection coating is developed and side effects are discussed. The experimental investigations were directed at determining whether the blue response of Si solar cells could be improved by phosphorus ion charges introduced into the oxide antireflection coating.

Low cost sol-gel derived SiC-SiO2 nanocomposite as anti reflection layer for enhanced performance of crystalline silicon solar cells

NASA Astrophysics Data System (ADS)

Jannat, Azmira; Lee, Woojin; Akhtar, M. Shaheer; Li, Zhen Yu; Yang, O.-Bong

2016-04-01

This paper describes the preparation, characterizations and the antireflection (AR) coating application in crystalline silicon solar cells of sol-gel derived SiC-SiO2 nanocomposite. The prepared SiC-SiO2 nanocomposite was effectively applied as AR layer on p-type Si-wafer via two step processes, where the sol-gel of precursor solution was first coated on p-type Si-wafer using spin coating at 2000 rpm and then subjected to annealing at 450 °C for 1 h. The crystalline, and structural observations revealed the existence of SiC and SiO2 phases, which noticeably confirmed the formation of SiC-SiO2 nanocomposite. The SiC-SiO2 layer on Si solar cells was found to be an excellent AR coating, exhibiting the low reflectance of 7.08% at wavelengths ranging from 400 to 1000 nm. The fabricated crystalline Si solar cell with SiC-SiO2 nanocomposite AR coating showed comparable power conversion efficiency of 16.99% to the conventional SixNx AR coated Si solar cell. New and effective sol-gel derived SiC-SiO2 AR layer would offer a promising technique to produce high performance Si solar cells with low-cost.

Solar thermophotovoltaic system using nanostructures

DOE PAGES

Ungaro, Craig; Gray, Stephen K.; Gupta, Mool C.

2015-08-20

This paper presents results on a highly efficient experimental solar thermophotovoltaic (STPV) system using simulated solar energy. An overall power conversion efficiency of 6.2% was recorded under solar simulation. This was matched with a thermodynamic model, and the losses within the system, as well as a path forward to mitigate these losses, have been investigated. The system consists of a planar, tungsten absorbing/emitting structure with an anti-reflection layer coated laser-microtextured absorbing surface and single-layer dielectric coated emitting surface. A GaSb PV cell was used to capture the emitted radiation and convert it into electrical energy. This simple structure is bothmore » easy to fabricate and temperature stable, and contains no moving parts or heat exchange fluids.« less

Polarization modeling and predictions for DKIST part 2: application of the Berreman calculus to spectral polarization fringes of beamsplitters and crystal retarders

NASA Astrophysics Data System (ADS)

Harrington, David M.; Snik, Frans; Keller, Christoph U.; Sueoka, Stacey R.; van Harten, Gerard

2017-10-01

We outline polarization fringe predictions derived from an application of the Berreman calculus for the Daniel K. Inouye Solar Telescope (DKIST) retarder optics. The DKIST retarder baseline design used six crystals, single-layer antireflection coatings, thick cover windows, and oil between all optical interfaces. This tool estimates polarization fringes and optic Mueller matrices as functions of all optical design choices. The amplitude and period of polarized fringes under design changes, manufacturing errors, tolerances, and several physical factors can now be estimated. This tool compares well with observations of fringes for data collected with the spectropolarimeter for infrared and optical regions at the Dunn Solar Telescope using bicrystalline achromatic retarders as well as laboratory tests. With this tool, we show impacts of design decisions on polarization fringes as impacted by antireflection coatings, oil refractive indices, cover window presence, and part thicknesses. This tool helped DKIST decide to remove retarder cover windows and also recommends reconsideration of coating strategies for DKIST. We anticipate this tool to be essential in designing future retarders for mitigation of polarization and intensity fringe errors in other high spectral resolution astronomical systems.

Laser pulse transmission and damage threshold of silica fibers with antireflective coatings

NASA Astrophysics Data System (ADS)

Meister, Stefan; Wosniok, Alexander; Riesbeck, Thomas; Scharfenorth, Chris; Eichler, Hans J.

2005-03-01

Standard 200 μm multimode fibers with Ta2O5/SiO2 antireflective coatings reach a transmission of more than 99.5% below the threshold of stimulated Brillouin scattering. The laser-induced damage threshold measured at 1064 nm and 24 ns pulse duration was about half than the LIDT of uncoated fibers.

Optimization of the antireflection coating of thin epitaxial crystalline silicon solar cells

DOE PAGES

Selj, Josefine K.; Young, David; Grover, Sachit

2015-08-28

In this study we use an effective weighting function to include the internal quantum efficiency (IQE) and the effective thickness, Te, of the active cell layer in the optical modeling of the antireflection coating (ARC) of very thin crystalline silicon solar cells. The spectrum transmitted through the ARC is hence optimized for efficient use in the given cell structure and the solar cell performance can be improved. For a 2-μm thick crystalline silicon heterojunction solar cell the optimal thickness of the Indium Tin Oxide (ITO) ARC is reduced by ~8 nm when IQE data and effective thickness are taken intomore » account compared to the standard ARC optimization, using the AM1.5 spectrum only. The reduced ARC thickness will shift the reflectance minima towards shorter wavelengths and hence better match the absorption of very thin cells, where the short wavelength range of the spectrum is relatively more important than the long, weakly absorbed wavelengths. For this cell, we find that the optimal thickness of the ITO starts at 63 nm for very thin (1 μm) active Si layer and then increase with increasing T e until it saturates at 71 nm for T e > 30 μm.« less

Pushing the Limits of Broadband and High-Frequency Metamaterial Silicon Antireflection Coatings

NASA Astrophysics Data System (ADS)

Coughlin, K. P.; McMahon, J. J.; Crowley, K. T.; Koopman, B. J.; Miller, K. H.; Simon, S. M.; Wollack, E. J.

2018-05-01

Broadband refractive optics realized from high-index materials provide compelling design solutions for the next generation of observatories for the cosmic microwave background and for sub-millimeter astronomy. In this paper, work is presented which extends the state of the art in silicon lenses with metamaterial antireflection coatings toward larger-bandwidth and higher-frequency operation. Examples presented include octave bandwidth coatings with less than 0.5% reflection, a prototype 4:1 bandwidth coating, and a coating optimized for 1.4 THz. For these coatings, the detailed design, fabrication and testing processes are described as well as the inherent performance trade-offs.

Reactive ion-beam-sputtering of fluoride coatings for the UV/VUV range

NASA Astrophysics Data System (ADS)

Schink, Harald; Kolbe, Jurgen; Zimmermann, F.; Ristau, Detlev; Welling, Herbert

1991-06-01

Fluoride coatings produced by thermal evaporation suffer from high scatter losses ageing and cracking due to high tensile stress. These problems impose severe limitations to the production of low loss multilayer coatings for the VUV range. A key position for improved performance is the microstructure of the layers. The aim of our investigations is to improve the microstructure of A1F3- and LaF3-'' films by ionbeamsputtering. Scatter measurements of single layers revealed lower values for lBS than for boat evaporation. Unfortunately sputtered fluoride films nave high absorption losses caused by decomposition of the coating material. By sputtering in reactive atmospheres and annealing we were able to reduce the absorption losses significantly. Antireflective as well as high reflective coatings were produced. Reflection and transmission values were obtained with a VUV-spectrophotometer. Damage tests at the 193 mu ArF laser wavelength were performed at the Laser-Laboratorium Gttingen. Key words: ion-beamsputtering fluoride films UVcoatings VUV-coatings color-center laser damage A]. F3 MgF2 LaF3. 1.

Record high efficiency of screen-printed silicon aluminum back surface field solar cell: 20.29%

NASA Astrophysics Data System (ADS)

Kim, Ki Hyung; Park, Chang Sub; Doo Lee, Jae; Youb Lim, Jong; Yeon, Je Min; Kim, Il Hwan; Lee, Eun Joo; Cho, Young Hyun

2017-08-01

We have achieved a record high cell efficiency of 20.29% for an industrial 6-in. p-type monocrystalline silicon solar cell with a full-area aluminum back surface field (Al-BSF) by simply modifying the cell structure and optimizing the process with the existing cell production line. The cell efficiency was independently confirmed by the Solar Energy Research Institute of Singapore (SERIS). To increase the cell efficiency, for example, in four busbars, double printing, a lightly doped emitter with a sheet resistance of 90 to 100 Ω/□, and front surface passivation by using silicon oxynitride (SiON) on top of a silicon nitride (SiN x ) antireflection layer were adopted. To optimize front side processing, PC1D simulation was carried out prior to cell fabrication. The resulting efficiency gain is 0.64% compared with that in the reference cells with three busbars, a single antireflection coating layer, and a low-sheet-resistance emitter.

Sol-Gel Deposited Double Layer TiO₂ and Al₂O₃ Anti-Reflection Coating for Silicon Solar Cell.

PubMed

Jung, Jinsu; Jannat, Azmira; Akhtar, M Shaheer; Yang, O-Bong

2018-02-01

In this work, the deposition of double layer ARC on p-type Si solar cells was carried out by simple spin coating using sol-gel derived Al2O3 and TiO2 precursors for the fabrication of crystalline Si solar cells. The first ARC layer was created by freshly prepared sol-gel derived Al2O3 precursor using spin coating technique and then second ARC layer of TiO2 was deposited with sol-gel derived TiO2 precursor, which was finally annealed at 400 °C. The double layer Al2O3/TiO2 ARC on Si wafer exhibited the low average reflectance of 4.74% in the wavelength range of 400 and 1000 nm. The fabricated solar cells based on double TiO2/Al2O3 ARC attained the conversion efficiency of ~13.95% with short circuit current (JSC) of 35.27 mA/cm2, open circuit voltage (VOC) of 593.35 mV and fill factor (FF) of 66.67%. Moreover, the fabricated solar cells presented relatively low series resistance (Rs) as compared to single layer ARCs, resulting in the high VOC and FF.

Development of selective surfaces. Semiannual technical progress report, September 11, 1978-April 30, 1979. [Multilayer coatings

DOE Office of Scientific and Technical Information (OSTI.GOV)

Thornton, J.A.

1979-06-15

Magnetron sputtering technology, which permits coatings to be deposited over large areas with significantly increased deposition rates, is reviewed with particular emphasis on cylindrical magnetrons and their application to reactive sputtering. Work is reported in which cylindrical-post magnetron sputtering sources have been used to deposit both graded and multi-layered cermet-type coatings by sputtering chromium and type 304 stainless steel in Ar and O/sub 2/ and Ar and CO gas mixtures under various conditions of reactive gas injection. The substrates are aluminum-coated glass and aluminum foil. The coatings are of an interference type, typically about 100 nm thick, with a metal-rich,more » highly absorbing layer adjacent to the substrate and a dielectric material at the surface. In some cases a reactively sputtered aluminum oxide anti-reflective surface layer has also been used. No advantages have been found for using chromium as opposed to the more readily available stainless steel. The reactive sputtering with CO is attractive because under many conditions the sputtering rates are relatively large compared to oxygen. Hemispherical absorptance and emittance data are reported. Typical absorptances are about 0.90 with emittances of 0.10.« less

I-III-VI.sub.2 based solar cell utilizing the structure CuInGaSe.sub.2 CdZnS/ZnO

DOEpatents

Chen, Wen S.; Stewart, John M.

1992-01-07

A thin film I-III-VI.sub.2 based solar cell having a first layer of copper indium gallium selenide, a second layer of cadmium zinc sulfide, a double layer of zinc oxide, and a metallization structure comprised of a layer of nickel covered by a layer of aluminum. An optional antireflective coating may be placed on said metallization structure. The cadmium zinc sulfide layer is deposited by means of an aqueous solution growth deposition process and may actually consist of two layers: a low zinc content layer and a high zinc content layer. Photovoltaic efficiencies of 12.5% at Air Mass 1.5 illumination conditions and 10.4% under AMO illumination can be achieved.

Stable Single-Mode Operation of Distributed Feedback Quantum Cascade Laser by Optimized Reflectivity Facet Coatings

NASA Astrophysics Data System (ADS)

Wang, Dong-Bo; Zhang, Jin-Chuan; Cheng, Feng-Min; Zhao, Yue; Zhuo, Ning; Zhai, Shen-Qiang; Wang, Li-Jun; Liu, Jun-Qi; Liu, Shu-Man; Liu, Feng-Qi; Wang, Zhan-Guo

2018-02-01

In this work, quantum cascade lasers (QCLs) based on strain compensation combined with two-phonon resonance design are presented. Distributed feedback (DFB) laser emitting at 4.76 μm was fabricated through a standard buried first-order grating and buried heterostructure (BH) processing. Stable single-mode emission is achieved under all injection currents and temperature conditions without any mode hop by the optimized antireflection (AR) coating on the front facet. The AR coating consists of a double layer dielectric of Al2O3 and Ge. For a 2-mm laser cavity, the maximum output power of the AR-coated DFB-QCL was more than 170 mW at 20 °C with a high wall-plug efficiency (WPE) of 4.7% in a continuous-wave (CW) mode.

The AMOS cell - An improved metal-semiconductor solar cell. [Antireflection coated Metal Oxide Semiconductor

NASA Technical Reports Server (NTRS)

Stirn, R. J.; Yeh, Y.-C. M.

1975-01-01

A new fabrication process is being developed which significantly improves the efficiency of metal-semiconductor solar cells. The resultant effect, a marked increase in the open-circuit voltage, is produced by the addition of an interfacial layer oxide on the semiconductor. Cells using gold on n-type gallium arsenide have been made in small areas (0.17 sq cm) with conversion efficiencies of 15% in terrestrial sunlight.

Improved opto-electronic properties of silicon heterojunction solar cells with SiO x /Tungsten-doped indium oxide double anti-reflective coatings

NASA Astrophysics Data System (ADS)

Yu, Jian; Zhou, Jie; Bian, Jiantao; Zhang, Liping; Liu, Yucheng; Shi, Jianhua; Meng, Fanying; Liu, Jinning; Liu, Zhengxin

2017-08-01

Amorphous SiO x was prepared by plasma enhanced chemical vapor deposition (PECVD) to form SiO x /tungsten-doped indium oxide (IWO) double anti-reflective coatings for silicon heterojunction (SHJ) solar cell. The sheet resistance of SiO x /IWO stacks decreases due to plasma treatment during deposition process, which means thinner IWO film would be deposited for better optical response. However, the comparisons of three anti-reflective coating (ARC) structures reveal that SiO x film limits carier transport and the path of IWO-SiO x -Ag structure is non-conductive. The decrease of sheet resistance is defined as pseudo conductivity. IWO film capping with SiO x allows observably reduced reflectance and better response in 300-400 and 600-1200 nm wavelength ranges. Compared with IWO single ARC, the average reflection is reduced by 1.65% with 70 nm SiO x /80 nm IWO double anti-reflective coatings (DARCs) in 500-1200 nm wavelength range, leading to growing external quantum efficiency response, short circuit current density (J sc), and efficiency. After well optimization of SiO x /IWO stacks, an impressive efficiency of 23.08% is obtained with high J sc and without compromising open circuit voltage (V oc) and fill factor. SiO x /IWO DARCs provide better anti-reflective properties over a broad range of wavelength, showing promising application for SHJ solar cells.

Nanostructured Anti-Reflecting and Water-Repellent Surface Coatings

ScienceCinema

None

2018-06-13

A nanotechnology-based surface-texturing method developed at Brookhaven Lab’s Center for Functional Nanomaterials imparts perfect anti-reflection and robust water-repellency to silicon, glass, and some plastics.

Zr-ZrO2 cermet solar coatings designed by modelling calculations and deposited by dc magnetron sputtering

NASA Astrophysics Data System (ADS)

Zhang, Qi-Chu; Hadavi, M. S.; Lee, K.-D.; Shen, Y. G.

2003-03-01

High solar performance Zr-ZrO2 cermet solar coatings were designed using a numerical computer model and deposited experimentally. The layer thickness and Zr metal volume fraction for the Zr-ZrO2 cermet solar selective coatings on a Zr or Al reflector with a surface ZrO2 or Al2O3 anti-reflection layer were optimized to achieve maximum photo-thermal conversion efficiency at 80°C under concentration factors of 1-20 using the downhill simplex method in multi-dimensions in the numerical calculation. The dielectric function and the complex refractive index of Zr-ZrO2 cermet materials were calculated using Sheng's approximation. Optimization calculations show that Al2O3/Zr-ZrO2/Al solar coatings with two cermet layers and three cermet layers have nearly identical solar absorptance, emittance and photo-thermal conversion efficiency that are much better than those for films with one cermet layer. The optimized Al2O3/Zr-ZrO2/Al solar coating film with two cermet layers has a high solar absorptance value of 0.97 and low hemispherical emittance value of 0.05 at 80°C for a concentration factor of 2. The Al2O3/Zr-ZrO2/Al solar selective coatings with two cermet layers were deposited using dc magnetron sputtering technology. During the deposition of Zr-ZrO2 cermet layer, a Zr metallic target was run in a gas mixture of argon and oxygen. By control of oxygen flow rate the different metal volume fractions in the cermet layers were achieved using dc reactive sputtering. A solar absorptance of 0.96 and normal emittance of 0.05 at 80°C were achieved.

Photovoltaic cell and production thereof

DOEpatents

Narayanan, Srinivasamohan [Gaithersburg, MD; Kumar, Bikash [Bangalore, IN

2008-07-22

An efficient photovoltaic cell, and its process of manufacture, is disclosed wherein the back surface p-n junction is removed from a doped substrate having an oppositely doped emitter layer. A front surface and edges and optionally the back surface periphery are masked and a back surface etch is performed. The mask is not removed and acts as an anti-reflective coating, a passivating agent, or both. The photovoltaic cell retains an untextured back surface whether or not the front is textured and the dopant layer on the back surface is removed to enhance the cell efficiency. Optionally, a back surface field is formed.

Thin film type 248-nm bottom antireflective coatings

NASA Astrophysics Data System (ADS)

Enomoto, Tomoyuki; Nakayama, Keisuke; Mizusawa, Kenichi; Nakajima, Yasuyuki; Yoon, Sangwoong; Kim, Yong-Hoon; Kim, Young-Ho; Chung, Hoesik; Chon, Sang Mun

2003-06-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13-micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity towards resist. SAMSUNG Electronics has developed the advanced Organic BARC with Nissan Chemical Industries, Ltd. and Brewer Science, Inc. for achieving the above purpose. As a result, the suitable high performance SNAC2002 series KrF Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of SNAC2002 series is about 1.4 times higher than that of conventional KrF resists and 1.25 times higher than the existing product. The SNAC2002 series can minimize the substrate reflectivity at below 40nm BARC thickness, shows excellent litho performance and coating properties.

Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

NASA Astrophysics Data System (ADS)

Kim, MyoungSoo; Kim, HakJoon; Shim, KewChan; Jeon, JeHa; Gil, MyungGoon; Song, YongWook; Enomoto, Tomoyuki; Sakaguchi, Takahiro; Nakajima, Yasuyuki

2005-05-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 100nm, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity toward resists. Hynix Semiconductor Inc., Nissan Chemical Industries, Ltd., and Brewer Science, Inc. have developed the advanced Organic BARC for achieving the above purpose. As a result, the suitable high performance 248nm Organic BARCs, NCA series, were achieved. Using CF4 gas as etchant, the plasma etch rate of NCA series is about 1.4 times higher than that of conventional 248nm resists. NCA series can be minimizing the substrate reflectivity at below 45nm BARC thickness. NCA series show the excellent litho performance and coating property on real device.

High temperature solar selective coatings

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kennedy, Cheryl E

Improved solar collectors (40) comprising glass tubing (42) attached to bellows (44) by airtight seals (56) enclose solar absorber tubes (50) inside an annular evacuated space (54. The exterior surfaces of the solar absorber tubes (50) are coated with improved solar selective coatings {48} which provide higher absorbance, lower emittance and resistance to atmospheric oxidation at elevated temperatures. The coatings are multilayered structures comprising solar absorbent layers (26) applied to the meta surface of the absorber tubes (50), typically stainless steel, topped with antireflective Savers (28) comprising at least two layers 30, 32) of refractory metal or metalloid oxides (suchmore » as titania and silica) with substantially differing indices of refraction in adjacent layers. Optionally, at least one layer of a noble metal such as platinum can be included between some of the layers. The absorbent layers cars include cermet materials comprising particles of metal compounds is a matrix, which can contain oxides of refractory metals or metalloids such as silicon. Reflective layers within the coating layers can comprise refractory metal silicides and related compounds characterized by the formulas TiSi. Ti.sub.3SiC.sub.2, TiAlSi, TiAN and similar compounds for Zr and Hf. The titania can be characterized by the formulas TiO.sub.2, Ti.sub.3O.sub.5. TiOx or TiO.sub.xN.sub.1-x with x 0 to 1. The silica can be at least one of SiO.sub.2, SiO.sub.2x or SiO.sub.2xN.sub.1-x with x=0 to 1.« less

Scandium oxide antireflection coatings for superluminescent LEDs

NASA Technical Reports Server (NTRS)

Ladany, I.; Zanzucchi, P. J.; Andrews, J. T.; Kane, J.; Depiano, E.

1986-01-01

For an employment of laser diodes as superluminescent LEDs (SLDs) or amplifiers, the facets of the diodes must be coated with antireflection films. In the work reported, scandium oxide was evaporated from an e-beam source onto Supersil II fused silica substrates. The obtained samples were used for measurements of absorption and reflectivity. Results of index measurements on e-beam evaporated films are presented. It is shown that excellent coatings with reflectivities of 0.00025 can be obtained using these films. Attention is given to the refractive indices for scandium oxide films as a function of wavelength, the power output vs current for laser before coating and after coating with Sc2O3.

Hexagonal arrays of round-head silicon nanopillars for surface anti-reflection applications

NASA Astrophysics Data System (ADS)

Yan, Wensheng; Dottermusch, Stephan; Reitz, Christian; Richards, Bryce S.

2016-10-01

We designed and fabricated an anti-reflection surface of hexagonal arrays of round-head silicon nanopillars. The measurements show a significant reduction in reflectivity across a broad spectral range. However, we then grew a conformal titanium dioxide coating via atomic layer deposition to achieve an extremely low weighted average reflection of 2.1% over the 460-1040 nm wavelength range. To understand the underlying reasons for the reduced reflectance, the simulations were conducted and showed that it is due to strong forward scattering of incident light into the silicon substrate. The calculated normalized scattering cross section demonstrates a broadband distribution feature, and the peak has a red-shift to longer wavelengths. Finally, we report two-dimensional weighted average reflectance as a function of both wavelength and angle of incidence and present the resulting analysis contour map.

Anti-reflection coatings on large area glass sheets

NASA Technical Reports Server (NTRS)

Pastirik, E.

1980-01-01

Antireflective coatings which may be suitable for use on the covers of photovoltaic solar modules can be easily produced by a dipping process. The coatings are applied to glass by drawing sheets of glass vertically out of dilute aqueous sodium silicate solutions at a constant speed, allowing the adherent liquid film to dry, then exposing the dried film to concentrated sulfuric acid, followed by a water rinse and dry. The process produces coatings of good optical performance (96.7 percent peak transmission at 0.540 mu M wavelength) combined with excellent stain and soil resistance, and good resistance to abrasion. The process is reproduceable and easily controlled.

[The research of UV-responsive sensitivity enhancement of fluorescent coating films by MgF2 layer].

PubMed

Lu, Zhong-Rong; Ni, Zheng-Ji; Tao, Chun-Xian; Hong, Rui-Jin; Zhang, Da-Wei; Huang, Yuan-Shen

2014-03-01

A low cost and less complicated expansion approach of wavelength responses with a Lumogen phosphor coating was adopted, as they increased the quantum efficiency of CCD and CMOS detectors in ultra-violet by absorbing UV light and then re emitting visible light. In this paper, the sensitivity enhancement of fluorescence coatings was studied by adding an anti-reflection film or barrier film to reduce the loss of the scattering and reflection on the incident interface. The Lumogen and MgF2/Lumogen film were deposited on quartz glasses by physical vacuum deposition. The surface morphology, transmittance spectrum, reflectance spectrum and fluorescence emission spectrum were obtained by atomic force microscope (AFM), spectrophotometer and fluorescence spectrometer, respectively. The results indicated that MgF2 film had obvious positive effect on reducing scattering and reflection loss in 500-700 nm, and enhancing the absorption of Lumogen coating in ultraviolet spectrum. Meanwhile, the fluorescent emission intensity had a substantial increase by smoothing the film surface and thus reducing the light scattering. At the same time, the MgF2 layer could protect Lumogen coating from damaging and contamination, which give a prolong lifetime of the UV-responsive CCD sensors with fluorescent coatings.

Stable Single-Mode Operation of Distributed Feedback Quantum Cascade Laser by Optimized Reflectivity Facet Coatings.

PubMed

Wang, Dong-Bo; Zhang, Jin-Chuan; Cheng, Feng-Min; Zhao, Yue; Zhuo, Ning; Zhai, Shen-Qiang; Wang, Li-Jun; Liu, Jun-Qi; Liu, Shu-Man; Liu, Feng-Qi; Wang, Zhan-Guo

2018-02-02

In this work, quantum cascade lasers (QCLs) based on strain compensation combined with two-phonon resonance design are presented. Distributed feedback (DFB) laser emitting at ~ 4.76 μm was fabricated through a standard buried first-order grating and buried heterostructure (BH) processing. Stable single-mode emission is achieved under all injection currents and temperature conditions without any mode hop by the optimized antireflection (AR) coating on the front facet. The AR coating consists of a double layer dielectric of Al 2 O 3 and Ge. For a 2-mm laser cavity, the maximum output power of the AR-coated DFB-QCL was more than 170 mW at 20 °C with a high wall-plug efficiency (WPE) of 4.7% in a continuous-wave (CW) mode.

Nanotip Carpets as Antireflection Surfaces

NASA Technical Reports Server (NTRS)

Bae, Youngsam; Mobasser, Sohrab; Manohara, Harish; Lee, Choonsup

2008-01-01

Carpet-like random arrays of metal-coated silicon nanotips have been shown to be effective as antireflection surfaces. Now undergoing development for incorporation into Sun sensors that would provide guidance for robotic exploratory vehicles on Mars, nanotip carpets of this type could also have many uses on Earth as antireflection surfaces in instruments that handle or detect ultraviolet, visible, or infrared light. In the original Sun-sensor application, what is required is an array of 50-micron-diameter apertures on what is otherwise an opaque, minimally reflective surface, as needed to implement a miniature multiple-pinhole camera. The process for fabrication of an antireflection nanotip carpet for this application (see Figure 1) includes, and goes somewhat beyond, the process described in A New Process for Fabricating Random Silicon Nanotips (NPO-40123), NASA Tech Briefs, Vol. 28, No. 1 (November 2004), page 62. In the first step, which is not part of the previously reported process, photolithography is performed to deposit etch masks to define the 50-micron apertures on a silicon substrate. In the second step, which is part of the previously reported process, the non-masked silicon area between the apertures is subjected to reactive ion etching (RIE) under a special combination of conditions that results in the growth of fluorine-based compounds in randomly distributed formations, known in the art as "polymer RIE grass," that have dimensions of the order of microns. The polymer RIE grass formations serve as microscopic etch masks during the next step, in which deep reactive ion etching (DRIE) is performed. What remains after DRIE is the carpet of nano - tips, which are high-aspect-ratio peaks, the tips of which have radii of the order of nanometers. Next, the nanotip array is evaporatively coated with Cr/Au to enhance the absorption of light (more specifically, infrared light in the Sun-sensor application). The photoresist etch masks protecting the apertures are then removed by dipping the substrate into acetone. Finally, for the Sun-sensor application, the back surface of the substrate is coated with a 57-nm-thick layer of Cr for attenuation of sunlight.

High-damage-threshold antireflection coatings on diamond for CW and pulsed CO2 lasers

NASA Astrophysics Data System (ADS)

Komlenok, M. S.; Pivovarov, P. A.; Volodkin, B. O.; Pavelyev, V. S.; Anisimov, V. I.; Butuzov, V. V.; Sorochenko, V. R.; Nefedov, S. M.; Mineev, A. P.; Soifer, V. A.; Konov, V. I.

2018-03-01

A multilayer antireflection coating for diamond optics that allows work in the infrared spectral range of 8 -12 µm with minimal optical losses is developed. The optical transmittance of a chemical vapour deposition diamond plate coated with this film on both sides exceeds 94% over the whole specified wavelength range. The coatings deposited on the diamond plate were damage-tested by coherent-wave and pulsed (τ  =  90 ns) CO2 lasers. Results of the tests demonstrated that the coating can withstand prolonged radiation loads with intensity above 3 MW cm-2 in a continuous-mode laser exposure. In the case of a nanosecond pulsed action, destruction of the coating begins at intensities greater than 50 MW cm-2.

The thickness correction of sol-gel coating using ion-beam etching in the preparation of antireflection coating

NASA Astrophysics Data System (ADS)

Dong, Siyu; Xie, Lingyun; He, Tao; Jiao, Hongfei; Bao, Ganghua; Zhang, Jinlong; Wang, Zhanshan; Cheng, Xinbin

2017-09-01

For the sol-gel method, it is still challenging to achieve excellent spectral performance when preparing antireflection (AR) coating by this way. The difficulty lies in controlling the film thickness accurately. To correct the thickness error of sol-gel coating, a hybrid approach that combined conventional sol-gel process with ion-beam etching technology was proposed in this work. The etching rate was carefully adjusted and calibrated to a relatively low value for removing the redundant material. Using atomic force microscope (AFM), it has been demonstrated that film surface morphology will not be changed in this process. After correcting the thickness error, an AR coating working at 1064 nm was prepared with transmittance higher than 99.5%.

Near zero reflection by nanostructured anti-reflection coating design for Si substrates

NASA Astrophysics Data System (ADS)

Al-Fandi, Mohamed; Makableh, Yahia F.; Khasawneh, Mohammad; Rabady, Rabi

2018-05-01

The nanostructure design of near zero reflection coating for Si substrates by using ZnO Nanoneedles (ZnONN) is performed and optimized for the visible spectral range. The design investigates the ZnONN tip to body ratio effect on the anti-reflection coating properties. Different tip to body ratios are used on Si substrates. Around zero reflection is achieved by the Nanoneedles structure design presented in this work, leading to minimal reflection losses from the Si surface. The current design evolves a solution to optical losses and surface contamination effects associated with Si solar cells.

Low-reflective wire-grid polarizers with absorptive interference overlayers.

PubMed

Suzuki, Motofumi; Takada, Akio; Yamada, Takatoshi; Hayasaka, Takashi; Sasaki, Kouji; Takahashi, Eiji; Kumagai, Seiji

2010-04-30

Wire-grid (WG) polarizers with low reflectivity for visible light have been successfully developed. We theoretically consider the optical properties of simple sandwich structures of absorptive layer/transparent layer (gap layer)/high-reflective mirrors and found that it is possible to develop an antireflection (AR) coating owing to the interference along with the absorption in the absorptive layer. A wide variety of materials can be used for AR coatings by tuning the thicknesses of both the absorptive and the gap layers. This AR concept has been applied to reduce the reflectance of WG polarizers of Al. FeSi(2) as an absorptive layer has been deposited by the glancing angle deposition technique immediately on the top of Al wires covered with a thin SiO(2) layer as a gap layer. For the optimum combination of the thicknesses of FeSi(2) and SiO(2), the reflectance becomes lower than a few per cent, independent of the polarization, whereas the transmission polarization properties remain good. Because low-reflective (LR) WG polarizers are completely composed of inorganic materials, they are useful for applications requiring high-temperature durability such as liquid crystal projection displays.

Functionalization of Semiconductor Nanomaterials for Optoelectronic Devices And Components

DTIC Science & Technology

2015-03-04

conversion efficiency of InAs quantum dot solar cell by using a single layer anatase TiO2 anti-reflection coating,” R. Vasan, Y. F. Makableh, J. C...dx.doi.org/10.1557//opl.2013.742 9. “The Optimization of InP/ZnS Core/Shell Nanocrystals and TiO2 Nanotubes for Quantum Dot Sensitized Solar Cells ...Quantum Dots Solar Cells Performance,” J. C. Sarker, Y. F. Makableh, R. Vasan, S. Lee, M. O. Manasreh, and M. Benamara, IEEE J. Photovoltaic. (submitted

Background-reducing X-ray multilayer mirror

DOEpatents

Bloch, Jeffrey J.; Roussel-Dupre', Diane; Smith, Barham W.

1992-01-01

Background-reducing x-ray multilayer mirror. A multiple-layer "wavetrap" deposited over the surface of a layered, synthetic-microstructure soft x-ray mirror optimized for reflectivity at chosen wavelengths is disclosed for reducing the reflectivity of undesired, longer wavelength incident radiation incident thereon. In three separate mirror designs employing an alternating molybdenum and silicon layered, mirrored structure overlaid by two layers of a molybdenum/silicon pair anti-reflection coating, reflectivities of near normal incidence 133, 171, and 186 .ANG. wavelengths have been optimized, while that at 304 .ANG. has been minimized. The optimization process involves the choice of materials, the composition of the layer/pairs as well as the number thereof, and the distance therebetween for the mirror, and the simultaneous choice of materials, the composition of the layer/pairs, and their number and distance for the "wavetrap."

Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films.

PubMed

Sun, Ke; Saadi, Fadl H; Lichterman, Michael F; Hale, William G; Wang, Hsin-Ping; Zhou, Xinghao; Plymale, Noah T; Omelchenko, Stefan T; He, Jr-Hau; Papadantonakis, Kimberly M; Brunschwig, Bruce S; Lewis, Nathan S

2015-03-24

Reactively sputtered nickel oxide (NiOx) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O2(g). These NiOx coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiOx films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O2(g).

Manufacturing and coating of optical components for the EnMAP hyperspectral imager

NASA Astrophysics Data System (ADS)

Schürmann, M.; Gäbler, D.; Schlegel, R.; Schwinde, S.; Peschel, T.; Damm, C.; Jende, R.; Kinast, J.; Müller, S.; Beier, M.; Risse, S.; Sang, B.; Glier, M.; Bittner, H.; Erhard, M.

2016-07-01

The optical system of the hyperspectral imager of the Environmental Mapping and Analysis Program (EnMAP) consists of a three-mirror anastigmat (TMA) and two independent spectrometers working in the VNIR and SWIR spectral range, respectively. The VNIR spectrometer includes a spherical NiP coated Al6061 mirror that has been ultra-precisely diamond turned and finally coated with protected silver as well as four curved fused silica (FS) and flint glass (SF6) prisms, respectively, each with broadband antireflection (AR) coating, while the backs of the two outer prisms are coated with a high-reflective coating. For AR coating, plasma ion assisted deposition (PIAD) has been used; the high-reflective enhanced Ag-coating on the backside has been deposited by magnetron sputtering. The SWIR spectrometer contains four plane and spherical gold-coated mirrors, respectively, and two curved FS prisms with a broadband antireflection coating. Details about the ultra-precise manufacturing of metal mirrors and prisms as well as their coating are presented in this work.

Surface Nanostructures Formed by Phase Separation of Metal Salt-Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications

NASA Astrophysics Data System (ADS)

Con, Celal; Cui, Bo

2017-12-01

This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties. Our method employed phase separation of a metal salt-polymer nanocomposite film that leads to nanoisland formation after etching away the polymer matrix, and the metal salt island can then be utilized as a hard mask for dry etching the substrate or sublayer. Compared to many other methods for patterning metallic hard mask structures, such as the popular lift-off method, our approach involves only spin coating and thermal annealing, thus is more cost-efficient. Metal salts including aluminum nitrate nonahydrate (ANN) and chromium nitrate nonahydrate (CNN) can both be used, and high aspect ratio (1:30) and high-resolution (sub-50 nm) pillars etched into silicon can be achieved readily. With further control of the etching profile by adjusting the dry etching parameters, cone-like silicon structure with reflectivity in the visible region down to a remarkably low value of 2% was achieved. Lastly, by coating a hydrophobic surfactant layer, the pillar array demonstrated a super-hydrophobic property with an exceptionally high water contact angle of up to 165.7°.

Surface Nanostructures Formed by Phase Separation of Metal Salt-Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications.

PubMed

Con, Celal; Cui, Bo

2017-12-16

This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties. Our method employed phase separation of a metal salt-polymer nanocomposite film that leads to nanoisland formation after etching away the polymer matrix, and the metal salt island can then be utilized as a hard mask for dry etching the substrate or sublayer. Compared to many other methods for patterning metallic hard mask structures, such as the popular lift-off method, our approach involves only spin coating and thermal annealing, thus is more cost-efficient. Metal salts including aluminum nitrate nonahydrate (ANN) and chromium nitrate nonahydrate (CNN) can both be used, and high aspect ratio (1:30) and high-resolution (sub-50 nm) pillars etched into silicon can be achieved readily. With further control of the etching profile by adjusting the dry etching parameters, cone-like silicon structure with reflectivity in the visible region down to a remarkably low value of 2% was achieved. Lastly, by coating a hydrophobic surfactant layer, the pillar array demonstrated a super-hydrophobic property with an exceptionally high water contact angle of up to 165.7°.

Irradiance enhancement and increased laser damage threshold in As₂S₃ moth-eye antireflective structures.

PubMed

Weiblen, R Joseph; Florea, Catalin M; Busse, Lynda E; Shaw, L Brandon; Menyuk, Curtis R; Aggarwal, Ishwar D; Sanghera, Jasbinder S

2015-10-15

It has been experimentally observed that moth-eye antireflective microstructures at the end of As2S3 fibers have an increased laser damage threshold relative to thin-film antireflective coatings. In this work, we computationally study the irradiance enhancement in As2S3 moth-eye antireflective microstructures in order to explain the increased damage threshold. We show that the irradiance enhancement occurs mostly on the air side of the interfaces and is minimal in the As2S3 material. We give a physical explanation for this behavior.

Scalable process for mitigation of laser-damaged potassium dihydrogen phosphate crystal optic surfaces with removal of damaged antireflective coating

DOE Office of Scientific and Technical Information (OSTI.GOV)

Elhadj, S.; Steele, W. A.; VanBlarcom, D. S.

Here, we investigate an approach for the recycling of laser-damaged large-aperture deuterated potassium dihydrogen phosphate (DKDP) crystals used for optical switching (KDP) and for frequency conversion (DKDP) in megajoule-class high-power laser systems. The approach consists of micromachining the surface laser damage sites (mitigation), combined with multiple soaks and ultrasonication steps in a coating solvent to remove, synergistically, both the highly adherent machining debris and the laser-damage-affected antireflection coating. We then identify features of the laser-damage-affected coating, such as the “solvent-persistent” coating and the “burned-in” coating, that are difficult to remove by conventional approaches without damaging the surface. We also providemore » a solution to the erosion problem identified in this work when colloidal coatings are processed during ultrasonication. Finally, we provide a proof of principle of the approach by testing the full process that includes laser damage mitigation of DKDP test parts, coat stripping, reapplication of a new antireflective coat, and a laser damage test demonstrating performance up to at least 12 J/cm 2 at UV wavelengths, which is well above current requirements. Our approach ultimately provides a potential path to a scalable recycling loop for the management of optics in large, high-power laser systems that can reduce cost and extend lifetime of highly valuable and difficult to grow large DKDP crystals.« less

Scalable process for mitigation of laser-damaged potassium dihydrogen phosphate crystal optic surfaces with removal of damaged antireflective coating

DOE PAGES

Elhadj, S.; Steele, W. A.; VanBlarcom, D. S.; ...

2017-03-07

Here, we investigate an approach for the recycling of laser-damaged large-aperture deuterated potassium dihydrogen phosphate (DKDP) crystals used for optical switching (KDP) and for frequency conversion (DKDP) in megajoule-class high-power laser systems. The approach consists of micromachining the surface laser damage sites (mitigation), combined with multiple soaks and ultrasonication steps in a coating solvent to remove, synergistically, both the highly adherent machining debris and the laser-damage-affected antireflection coating. We then identify features of the laser-damage-affected coating, such as the “solvent-persistent” coating and the “burned-in” coating, that are difficult to remove by conventional approaches without damaging the surface. We also providemore » a solution to the erosion problem identified in this work when colloidal coatings are processed during ultrasonication. Finally, we provide a proof of principle of the approach by testing the full process that includes laser damage mitigation of DKDP test parts, coat stripping, reapplication of a new antireflective coat, and a laser damage test demonstrating performance up to at least 12 J/cm 2 at UV wavelengths, which is well above current requirements. Our approach ultimately provides a potential path to a scalable recycling loop for the management of optics in large, high-power laser systems that can reduce cost and extend lifetime of highly valuable and difficult to grow large DKDP crystals.« less

"Wetting enhancer" pullulan coating for antifog packaging applications.

PubMed

Introzzi, Laura; Fuentes-Alventosa, José María; Cozzolino, Carlo A; Trabattoni, Silvia; Tavazzi, Silvia; Bianchi, Claudia L; Schiraldi, Alberto; Piergiovanni, Luciano; Farris, Stefano

2012-07-25

A new antifog coating made of pullulan is described in this work. The antifog properties are discussed in terms of wettability, surface chemistry/morphology, and by quantitative assessment of the optical properties (haze and transparency) before and after fog formation. The work also presents the results of antifog tests simulating the typical storage conditions of fresh foods. In these tests, the antifog efficiency of the pullulan coating was compared with that of two commercial antifog films, whereas an untreated low-density polyethylene (LDPE) film was used as a reference. The obtained results revealed that the pullulan coating behaved as a "wetting enhancer", mainly due to the low water contact angle (∼24°), which in turn can be ascribed to the inherent hydrophilic nature of this polysaccharide, as also suggested by the X-ray photoelectron spectroscopy experiments. Unlike the case of untreated LDPE and commercial antifog samples, no discrete water formations (i.e., droplets or stains) were observed on the antifog pullulan coating on refrigeration during testing. Rather, an invisible, continuous and thin layer of water occurred on the biopolymer surface, which was the reason for the unaltered haze and increased transparency, with the layer of water possibly behaving as an antireflection layer. As confirmed by atomic force microscopy analysis, the even deposition of the coating on the plastic substrate compared to the patchy surfacing of the antifog additives in the commercial films is another important factor dictating the best performance of the antifog pullulan coating.

Moisture resistant and anti-reflection optical coatings produced by plasma polymerization of organic compounds

NASA Technical Reports Server (NTRS)

Hollahan, J. R.; Wydeven, T.

1975-01-01

The need for protective coatings on critical optical surfaces, such as halide crystal windows or lenses used in spectroscopy, has long been recognized. It has been demonstrated that thin, one micron, organic coatings produced by polymerization of flourinated monomers in low temperature gas discharge (plasma) exhibit very high degrees of moisture resistence, e.g., hundreds of hours protection for cesium iodide vs. minutes before degradation sets in for untreated surfaces. The index of refraction of these coatings is intermediate between that of the halide substrate and air, a condition for anti-reflection, another desirable property of optical coatings. Thus, the organic coatings not only offer protection, but improved transmittance as well. The polymer coating is non-absorbing over the range 0.4 to 40 microns with an exception at 8.0 microns, the expected absorption for C-F bonds.

Thin film and high-etch-rate type 248-nm bottom antireflective coatings

NASA Astrophysics Data System (ADS)

Enomoto, Tomoyuki; Takei, Satoshi; Kishioka, Takahiro; Hatanaka, Tadashi; Sakamoto, Rikimaru; Nakajima, Yasuyuki

2004-05-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13 micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity toward resists. Nissan Chemical Industries, Ltd. and Brewer Science, Inc. have developed the advanced Organic BARC for achieving the above purpose. As a result, the suitable high performance NCA3000 series 248nm Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of NCA3000 series is about 1.4-1.6 times higher than that of conventional 248nm resists and 1.1-1.2 times higher than that of the existing product. The NCA3000 series can minimize the substrate reflectivity at below 45nm BARC thickness, shows excellent litho performance and coating properties.

Anti-reflective device having an anti-reflective surface formed of silicon spikes with nano-tips

NASA Technical Reports Server (NTRS)

Bae, Youngsam (Inventor); Manohara, Harish (Inventor); Mobasser, Sohrab (Inventor); Lee, Choonsup (Inventor)

2011-01-01

Described is a device having an anti-reflection surface. The device comprises a silicon substrate with a plurality of silicon spikes formed on the substrate. A first metallic layer is formed on the silicon spikes to form the anti-reflection surface. The device further includes an aperture that extends through the substrate. A second metallic layer is formed on the substrate. The second metallic layer includes a hole that is aligned with the aperture. A spacer is attached with the silicon substrate to provide a gap between an attached sensor apparatus. Therefore, operating as a Micro-sun sensor, light entering the hole passes through the aperture to be sensed by the sensor apparatus. Additionally, light reflected by the sensor apparatus toward the first side of the silicon substrate is absorbed by the first metallic layer and silicon spikes and is thereby prevented from being reflected back toward the sensor apparatus.

Laser pulse power transmission limits of silica fibers with antireflective coating

NASA Astrophysics Data System (ADS)

Meister, St.; Wosniok, A.; Seewald, G.; Scharfenorth, Ch.; Eichler, H. J.

2005-04-01

Multimode optical fibers are used for the transmission of high power laser pulses and as phase conjugated mirrors by stimulated Brillouin scattering. Both applications are enhanced by antireflection coatings on the fiber end-faces. Fiber transmissions reach more than 99.5% for pulse energies below the threshold of stimulated Brillouin scattering. Laser-induced damage thresholds of the fibers coated with Ta2O5 / SiO2 were measured at 1064 nm and 24 ns pulse duration. A damage threshold of up to 101 J/cm2 could be achieved. The damage morphology was investigated using atomic force microscopy and scanning electron microscopy.

Light Trapping for Silicon Solar Cells: Theory and Experiment

NASA Astrophysics Data System (ADS)

Zhao, Hui

Crystalline silicon solar cells have been the mainstream technology for photovoltaic energy conversion since their invention in 1954. Since silicon is an indirect band gap material, its absorption coefficient is low for much of the solar spectrum, and the highest conversion efficiencies are achieved only in cells that are thicker than about 0.1 mm. Light trapping by total internal reflection is important to increase the optical absorption in silicon layers, and becomes increasingly important as the layers are thinned. Light trapping is typically characterized by the enhancement of the absorptance of a solar cell beyond the value for a single pass of the incident beam through an absorbing semiconductor layer. Using an equipartition argument, in 1982 Yablonovitch calculated an enhancement of 4n2 , where n is the refractive index. We have extracted effective light-trapping enhancements from published external quantum efficiency spectra in several dozen silicon solar cells. These results show that this "thermodynamic" enhancement has never been achieved experimentally. The reasons for incomplete light trapping could be poor anti-reflection coating, inefficient light scattering, and parasitic absorption. We report the light-trapping properties of nanocrystalline silicon nip solar cells deposited onto two types of Ag/ZnO backreflectors at United Solar Ovonic, LLC. We prepared the first type by first making silver nanparticles onto a stainless steel substrate, and then overcoating the nanoparticles with a second silver layer. The second type was prepared at United Solar using a continuous silver film. Both types were then overcoated with a ZnO film. The root mean square roughness varied from 27 to 61 nm, and diffuse reflectance at 1000 nm wavelength varied from 0.4 to 0.8. The finished cells have a thin, indium-tin oxide layer on the top that acts as an antireflection coating. For both backreflector types, the short-circuit photocurrent densities J SC for solar illumination were about 25 mA/cm2 for 1.5 micron cells. We also measured external quantum efficiency spectra and optical reflectance spectra, which were only slightly affected by the back reflector morphology. We performed a thermodynamic calculation for the optical absorptance in the silicon layer and the top oxide layer to explain the experimental results; the calculation is an extension of previous work by Stuart and Hall that incorporates the antireflection properties and absorption in the top oxide film. From our calculations and experimental measurements, we concluded that parasitic absorption in this film is the prominent reason for incomplete light trapping in these cells. To reduce the optical parasitic loss in the top oxide layer, we propose a bilayer design, and show the possible benefits to the photocurrent density.

Cascaded Ga1-xAlxAs/GaAs solar cell with graded i-region

NASA Astrophysics Data System (ADS)

Mil'shtein, Sam; Halilov, Samed

2018-02-01

In current study we designed p-i-n junction with extended intrinsic layer, where linearly graded Alx Ga1-x As presents variable energy gap so needed for effective harvesting of sun radiation. The design realization involves two regions of compositional structure in the stacking direction. The top AlxGa1-xAs layer of 1 um total thickness has stoichiometric structure x=0.3-0.2d, where depth d runs from 0 to 1 um, topmost 200 nm of which is Be-doped. Bottom AlxGa1-xAs layer of 3 um total thickness has a variable composition of x=0.133-0.033d, d runs from 1 to 4 um, the very bottom of which with 10 nm thickness is Si-doped. On the top surface, there is a 50 nm layer of p+ doped GaAs as a spacer for growing AuGe/Ni anode electrode of 20% surface area, the bottom is coated with AuGe/Ni cathode electrode. The designed cell demonstrates 89% fill factor and 30% conversion efficiency without anti-reflection coating.

Broad-bandwidth Metamaterial Antireflection Coatings for Sub-Millimeter Astronomy and CMB Foreground Removal

NASA Astrophysics Data System (ADS)

McMahon, Jeff

Sub-millimeter observations are crucial for answering questions about star and galaxy formation; understanding galactic dust foregrounds; and for removing these foregrounds to detect the faint signature of inflationary gravitational waves in the polarization of the Cosmic Microwave Background (CMB). Achieving these goals requires improved, broad-band antireflection coated lenses and half-wave plates (HWPs). These optical elements will significantly boost the sensitivity and capability of future sub-millimeter and CMB missions. We propose to develop wide-bandwidth metamaterial antireflection coatings for silicon lenses and sapphire HWPs with 3:1 ratio bandwidth that are scalable across the sub-millimeter band from 300 GHz to 3 THz. This is an extension of our successful work on saw cut metamaterial AR coatings for silicon optics at millimeter wave lengths. These, and the proposed coatings consist of arrays of sub-wavelength scale features cut into optical surfaces that behave like simple dielectrics. We have demonstrated saw cut 3:1 bandwidth coatings on silicon lenses, but these coatings are limited to the millimeter wave band by the limitations of dicing saw machining. The crucial advance needed to extend these broad band coatings throughout the sub-millimeter band is the development of laser cut graded index metamaterial coatings. The proposed work includes developing the capability to fabricate these coatings, optimizing the design of these metamaterials, fabricating and testing prototype lenses and HWPs, and working with the PIPER collaboration to achieve a sub-orbital demonstration of this technology. The proposed work will develop potentially revolutionary new high performance coatings for the sub-millimeter bands, and cary this technology to TRL 7 paving the way for its use in space. We anticipate that there will be a wide range of applications for these coatings on future NASA balloons and satellites.

Novel Passivating/Antireflective Coatings for Space Solar Cells

NASA Technical Reports Server (NTRS)

Faur, Mircea; Faur, Maria; Bailey, S. G.; Flood, D. J.; Faur, H. M.; Mateescu, C. G.; Alterovitz, S. A.; Scheiman, D.; Jenkins, P. P.; Brinker, D. J.

2005-01-01

We are developing a novel process to grow passivating/antireflective (AR) coatings for terrestrial and space solar cells. Our approach involves a Room Temperature Wet Chemical Growth (RTWCG) process, which was pioneered, and is under development at SPECMAT, Inc., under a Reimbursable Space Act Agreement with NASA Glenn Research Center. The RTWCG passivating/AR coatings with graded index of refraction are applied in one easy step on finished (bare) cells. The RTWCG coatings grown on planar, textured and porous Si, as well as on poly-Si, CuInSe2, and III-V substrates, show excellent uniformity irrespective of surface topography, crystal orientation, size and shape. In this paper we present some preliminary results of the RTWCG coatings on Si and III-V substrates that show very good potential for use as a passivation/AR coating for space solar cell applications. Compared to coatings grown using conventional techniques, the RTWCG coatings have the potential to reduce reflection losses and improve current collection near the illuminated surface of space solar cells, while reducing the fabrication costs.

Studies and testing of antireflective (AR) coatings for soda-lime glass

NASA Technical Reports Server (NTRS)

Pastirik, E. M.; Sparks, T. G.; Coleman, M. G.

1978-01-01

Processes for producing antireflection films on glass are concentrated in three areas: acid etching of glass, plasma etching of glass, and acid development of sodium silicate films on glass. The best transmission was achieved through the acid etching technique, while the most durable films were produced from development of sodium silicate films. Control of the acid etching technique is presently inadequate for production implementation. While films having excellent antireflective properties were fabricated by plasma etching techniques, all were water soluble.

Method of Fabricating Schottky Barrier solar cell

NASA Technical Reports Server (NTRS)

Stirn, R. J.; Yeh, Y. C. M. (Inventor)

1982-01-01

On a thin substrate of low cost material with at least the top surface of the substrate being electrically conductive is deposited a thin layer of heavily doped n-type polycrystalline germanium, with crystalline sizes in the submicron range. A passivation layer may be deposited on the substrate to prevent migration of impurities into the polycrystalline germanium. The polycrystalline germanium is recrystallized to increase the crystal sizes in the germanium layer to not less than 5 micros to serve as a base layer on which a thin layer of gallium arsenide is vapor epitaxially grown to a selected thickness. A thermally-grown oxide layer of a thickness of several tens of angstroms is formed on the gallium arsenide layer. A metal layer, of not more about 100 angstroms thick, is deposited on the oxide layer, and a grid electrode is deposited to be in electrical contact with the top surface of the metal layer. An antireflection coating may be deposited on the exposed top surface of the metal layer.

Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films

DOE PAGES

Sun, Ke; Saadi, Fadl H.; Lichterman, Michael F.; ...

2015-03-11

Reactively sputtered nickel oxide (NiO x) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O 2(g). These NiO x coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Finally, under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiO x films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of watermore » to O 2(g).« less

Large integrated absorption enhancement in plasmonic solar cells by combining metallic gratings and antireflection coatings.

PubMed

Munday, Jeremy N; Atwater, Harry A

2011-06-08

We describe an ultrathin solar cell architecture that combines the benefits of both plasmonic photovoltaics and traditional antireflection coatings. Spatially resolved electron generation rates are used to determine the total integrated current improvement under AM1.5G solar illumination, which can reach a factor of 1.8. The frequency-dependent absorption is found to strongly correlate with the occupation of optical modes within the structure, and the improved absorption is mainly attributed to improved coupling to guided modes rather than localized resonant modes.

Sol-Gel Processing of MgF₂ Antireflective Coatings.

PubMed

Löbmann, Peer

2018-05-02

There are different approaches for the preparation of porous antireflective λ/4 MgF₂ films from liquid precursors. Among these, the non-aqueous fluorolytic synthesis of precursor solutions offers many advantages in terms of processing simplicity and scalability. In this paper, the structural features and optical performance of the resulting films are highlighted, and their specific interactions with different inorganic substrates are discussed. Due to their excellent abrasion resistance, coatings have a high potential for applications on glass. Using solvothermal treatment of precursor solutions, also the processing of thermally sensitive polymer substrates becomes feasible.

Infrared wire-grid polarizer with sol-gel antireflection films on both sides

NASA Astrophysics Data System (ADS)

Yamada, Itsunari; Ishihara, Yoshiro

2017-12-01

We fabricated an infrared wire-grid polarizer with the high transverse magnetic (TM) polarization transmittance and high extinction ratio by soft imprint lithography, sol-gel method, and Al shadow coating processes. A zilconia film was coated on Si substrate by using sol-gel method and spin coating method. Then, sol-gel zirconia grating was formed on the back side using imprinting using a silicone mold. The polarizer was produced by depositing Al obliquely on the grating. The TM transmittance of the fabricated element was greater than 80% at a wavelength of 4.8 μm. The sol-gel zilconia films acted as antireflection films. The extinction ratio exceeded 26 dB at its wavelength.

193-nm multilayer imaging systems

NASA Astrophysics Data System (ADS)

Meador, James D.; Holmes, Doug; DiMenna, William; Nagatkina, Mariya I.; Rich, Michael D.; Flaim, Tony D.; Bennett, Randy; Kobayashi, Ichiro

2003-06-01

This paper highlights the performance of new materials that have been developed for use in 193-nm trilayer microlithography. The products are embedded etch masking layers (EMLs) and bottom antireflective coatings (BARCs). Both coatings are spin applied from organic solvent(s) and then thermoset during a hot plate bake. The EMLs (middle layers) are imaging compatible with JSR, Sumitomo, and TOK 193-nm photoresists. Best-case trilayer film stacks have given 100-nm dense and semi-dense L/S. Plasma etching, selectivities and solution compatibility performance of the EMLs meet or exceed proposed product targets. In addition, the EMLs exhibit both solution and plasma etching properties that should lead to successful rework processes for photoresists. The multiplayer BARCs offer good thick film coating quality and contribute to excellent images when used in trilayer applications. Combining the EMLs, which are nearly optically transparent (k=0.04) at 193-nm, with the new trilayer BARCs results in outstanding Prolith simulated reflectance control. In one modeling example, reflectance is a flat line at 0.5% on five different substrates for BARC thicknesses between 300 and 700-nm.

Silica nanoparticles on front glass for efficiency enhancement in superstrate-type amorphous silicon solar cells

NASA Astrophysics Data System (ADS)

Das, Sonali; Banerjee, Chandan; Kundu, Avra; Dey, Prasenjit; Saha, Hiranmay; Datta, Swapan K.

2013-10-01

Antireflective coating on front glass of superstrate-type single junction amorphous silicon solar cells (SCs) has been applied using highly monodispersed and stable silica nanoparticles (NPs). The silica NPs having 300 nm diameter were synthesized by Stober technique where the size of the NPs was controlled by varying the alcohol medium. The synthesized silica NPs were analysed by dynamic light scattering technique and Fourier transform infrared spectroscopy. The NPs were spin coated on glass side of fluorinated tin oxide (SnO2: F) coated glass superstrate and optimization of the concentration of the colloidal solution, spin speed and number of coated layers was done to achieve minimum reflection characteristics. An estimation of the distribution of the NPs for different optimization parameters has been done using field-emission scanning electron microscopy. Subsequently, the transparent conducting oxide coated glass with the layer having the minimum reflectance is used for fabrication of amorphous silicon SC. Electrical analysis of the fabricated cell indicates an improvement of 6.5% in short-circuit current density from a reference of 12.40 mA cm-2 while the open circuit voltage and the fill factor remains unaltered. A realistic optical model has also been proposed to gain an insight into the system.

Wide-band 'black silicon' with atomic layer deposited NbN.

PubMed

Isakov, Kirill; Perros, Alexander Pyymaki; Shah, Ali; Lipsanen, Harri

2018-08-17

Antireflection surfaces are often utilized in optical components to reduce undesired reflection and increase absorption. We report on black silicon (b-Si) with dramatically enhanced absorption over a broad wavelength range (250-2500 nm) achieved by applying a 10-15 nm conformal coating of NbN with atomic layer deposition (ALD). The improvement is especially pronounced in the near infrared (NIR) range of 1100-2500 nm where absorption is increased by >90%. A significant increase of absorption is also observed over the ultraviolet range of 200-400 nm. Preceding NbN deposition with a nanostructured ALD Al 2 O 3 (n-Al 2 O 3 ) coating to enhance the NbN texture was also examined. Such texturing further improves absorption in the NIR, especially at longer wavelengths, strong absorption up to 4-5 μm wavelengths has been attested. For comparison, double side polished silicon and sapphire coated with 10 nm thick NbN exhibited absorption of only ∼55% in the NIR range of 1100-2500 nm. The results suggest a positive correlation between the surface area of NbN coating and optical absorption. Based on the wide-band absorption, the presented NbN-coated b-Si may be an attractive candidate for use in e.g. spectroscopic systems, infrared microbolometers.

Substrate-Versatile Approach to Robust Antireflective and Superhydrophobic Coatings with Excellent Self-Cleaning Property in Varied Environments.

PubMed

Ren, Tingting; He, Junhui

2017-10-04

Robust antireflective and superhydrophobic coatings are highly desired in wide applications, such as optical devices, solar cell panels, architectural and automotive glasses, lab-on chip systems, and windows for electronic devices. Meanwhile, simple, low-cost, and substrate-versatile fabrication is also essential toward real applications of such coatings. Herein, we developed a substrate-versatile strategy to fabricate robust antireflective and superhydrophobic coatings with excellent self-cleaning property in varied environments, including air and oil and after oil contamination. A mixed ethanol suspension, which consists of 1H,1H,2H,2H-perfluorooctyltriethoxysilane modified dual-sized silica nanoparticles and acid-catalyzed silica precursor, was first synthesized. The acid-catalyzed silica precursor could help to form a highly cross-linked silica network by connecting the silica nanoparticles, thus significantly enhancing the robustness of coatings. The as-prepared coatings were able to withstand a water drop impact test, sand abrasion test, tape adhesion test, and knife and pencil scratching tests. More importantly, it was also found that the wettability and self-cleaning property of coatings after oil contamination were surprisingly different from those in air and oil. These observations are explainable by the alteration of interface; i.e., the alteration of interface has significant effects on the functional properties of coatings. Additionally, the mixed suspension could be sprayed onto various hard and soft substrates including glass, polyethylene terephthalate (PET), polycarbonate (PC), and poly(methyl methacrylate) (PMMA), opening up a feasible route toward varied practical applications in solar cell panels, optical devices, architectural and automotive glasses, droplet manipulators, and fluid control.

Laser damage threshold measurements of microstructure-based high reflectors

NASA Astrophysics Data System (ADS)

Hobbs, Douglas S.

2008-10-01

In 2007, the pulsed laser induced damage threshold (LIDT) of anti-reflecting (AR) microstructures built in fused silica and glass was shown to be up to three times greater than the LIDT of single-layer thin-film AR coatings, and at least five times greater than multiple-layer thin-film AR coatings. This result suggested that microstructure-based wavelength selective mirrors might also exhibit high LIDT. Efficient light reflection over a narrow spectral range can be produced by an array of sub-wavelength sized surface relief microstructures built in a waveguide configuration. Such surface structure resonant (SSR) filters typically achieve a reflectivity exceeding 99% over a 1-10nm range about the filter center wavelength, making SSR filters useful as laser high reflectors (HR). SSR laser mirrors consist of microstructures that are first etched in the surface of fused silica and borosilicate glass windows and subsequently coated with a thin layer of a non-absorbing high refractive index dielectric material such as tantalum pent-oxide or zinc sulfide. Results of an initial investigation into the LIDT of single layer SSR laser mirrors operating at 532nm, 1064nm and 1573nm are described along with data from SEM analysis of the microstructures, and spectral reflection measurements. None of the twelve samples tested exhibited damage thresholds above 3 J/cm2 when illuminated at the resonant wavelength, indicating that the simple single layer, first order design will need further development to be suitable for high power laser applications. Samples of SSR high reflectors entered in the Thin Film Damage Competition also exhibited low damage thresholds of less than 1 J/cm2 for the ZnS coated SSR, and just over 4 J/cm2 for the Ta2O5 coated SSR.

One-Pot Fabrication of Antireflective/Antibacterial Dual-Function Ag NP-Containing Mesoporous Silica Thin Films.

PubMed

Wang, Kaikai; He, Junhui

2018-04-04

Thin films that integrate antireflective and antibacterial dual functions are not only scientifically interesting but also highly desired in many practical applications. Unfortunately, very few studies have been devoted to the preparation of thin films with both antireflective and antibacterial properties. In this study, mesoporous silica (MSiO 2 ) thin films with uniformly dispersed Ag nanoparticles (Ag NPs) were prepared through a one-pot process, which simultaneously shows high transmittance, excellent antibacterial activity, and mechanical robustness. The optimal thin-film-coated glass substrate demonstrates a maximum transmittance of 98.8% and an average transmittance of 97.1%, respectively, in the spectral range of 400-800 nm. The growth and multiplication of typical bacteria, Escherichia coli ( E. coli), were effectively inhibited on the coated glass. Pencil hardness test, tape adhesion test, and sponge washing test showed favorable mechanical robustness with 5H pencil hardness, 5A grade adhesion, and functional durability of the coating, which promises great potential for applications in various touch screens, windows for hygiene environments, and optical apparatuses for medical uses such as endoscope, and so on.

Self-assembled nanotextures impart broadband transparency to glass windows and solar cell encapsulants

DOE Office of Scientific and Technical Information (OSTI.GOV)

Liapis, Andreas C.; Rahman, Atikur; Black, Charles T.

Most optoelectronic components and consumer display devices require glass or plastic covers for protection against the environment. Optical reflections from these encapsulation layers can degrade the device performance or lessen the user experience. In this paper, we use a highly scalable self-assembly based approach to texture glass surfaces at the nanoscale, reducing reflections by such an extent so as to make the glass essentially invisible. Our nanotextures provide broadband antireflection spanning visible and infrared wavelengths (450–2500 nm) that is effective even at large angles of incidence. This technology can be used to improve the performance of photovoltaic devices by eliminatingmore » reflection losses, which can be as much as 8% for glass encapsulated cells. In contrast, solar cells encapsulated with nanotextured glass generate the same photocurrent as when operated without a cover. Finally, ultra-transparent windows having surface nanotextures on both sides can withstand three times more optical fluence than commercial broadband antireflection coatings, making them useful for pulsed laser applications.« less

Self-assembled nanotextures impart broadband transparency to glass windows and solar cell encapsulants

DOE PAGES

Liapis, Andreas C.; Rahman, Atikur; Black, Charles T.

2017-10-30

Most optoelectronic components and consumer display devices require glass or plastic covers for protection against the environment. Optical reflections from these encapsulation layers can degrade the device performance or lessen the user experience. In this paper, we use a highly scalable self-assembly based approach to texture glass surfaces at the nanoscale, reducing reflections by such an extent so as to make the glass essentially invisible. Our nanotextures provide broadband antireflection spanning visible and infrared wavelengths (450–2500 nm) that is effective even at large angles of incidence. This technology can be used to improve the performance of photovoltaic devices by eliminatingmore » reflection losses, which can be as much as 8% for glass encapsulated cells. In contrast, solar cells encapsulated with nanotextured glass generate the same photocurrent as when operated without a cover. Finally, ultra-transparent windows having surface nanotextures on both sides can withstand three times more optical fluence than commercial broadband antireflection coatings, making them useful for pulsed laser applications.« less

Ultralow refractive index optical films with enhanced mechanical performance obtained by hybrid glancing angle deposition.

PubMed

Trottier-Lapointe, W; Zabeida, O; Schmitt, T; Martinu, L

2016-11-01

Ultralow refractive index materials (n less than 1.38 at 550 nm) are of particular interest in the context of antireflective coatings, allowing one to enhance their overall optical performance. However, application of such materials is typically limited by their mechanical properties. In this study, we explore the characteristics of a new category of hybrid (organic/inorganic) SiOCH thin films prepared by glancing angle deposition (GLAD) using electron beam evaporation of SiO₂ in the presence of an organosilicon precursor. The resulting layers exhibited n as low as 1.2, showed high elastic rebound, and generally better mechanical properties than their inorganic counterparts. In addition, hybrid GLAD films were found to be highly hydrophobic. The performance of the films is discussed in terms of their hybridicity (organic/inorganic) ratio determined by infrared spectroscopic ellipsometry as well as the presence of anisotropy assessed by the nanostructure-based spectroscopic ellipsometry model. Finally, we demonstrate successful implementation of the ultralow-index material in a complete antireflective stack.

Self-assembled nanotextures impart broadband transparency to glass windows and solar cell encapsulants

NASA Astrophysics Data System (ADS)

Liapis, Andreas C.; Rahman, Atikur; Black, Charles T.

2017-10-01

Most optoelectronic components and consumer display devices require glass or plastic covers for protection against the environment. Optical reflections from these encapsulation layers can degrade the device performance or lessen the user experience. Here, we use a highly scalable self-assembly based approach to texture glass surfaces at the nanoscale, reducing reflections by such an extent so as to make the glass essentially invisible. Our nanotextures provide broadband antireflection spanning visible and infrared wavelengths (450-2500 nm) that is effective even at large angles of incidence. This technology can be used to improve the performance of photovoltaic devices by eliminating reflection losses, which can be as much as 8% for glass encapsulated cells. In contrast, solar cells encapsulated with nanotextured glass generate the same photocurrent as when operated without a cover. Ultra-transparent windows having surface nanotextures on both sides can withstand three times more optical fluence than commercial broadband antireflection coatings, making them useful for pulsed laser applications.

Efficient semitransparent perovskite solar cells for 23.0%-efficiency perovskite/silicon four-terminal tandem cells

DOE PAGES

Chen, Bo; Bai, Yang; Yu, Zhengshan; ...

2016-07-19

Here, we have investigated semi-transparent perovskite solar cells and infrared enhanced silicon heterojunction cells for high-efficiency tandem devices. A semi-transparent metal electrode with good electrical conductivity and optical transparency has been fabricated by thermal evaporation of 7 nm of Au onto a 1-nm-thick Cu seed layer. For this electrode to reach its full potential, MAPbI3 thin films were formed by a modified one-step spin-coating method, resulting in a smooth layer that allowed the subsequent metal thin film to remain continuous. The fabricated semi-transparent perovskite solar cells demonstrated 16.5% efficiency under one-sun illumination, and were coupled with infrared-enhanced silicon heterojunction cellsmore » tuned specifically for perovskite/Si tandem devices. A double-layer antireflection coating at the front side and MgF2 reflector at rear side of the silicon heterojunction cells reduced parasitic absorption of near-infrared light, leading to 6.5% efficiency after filtering with a perovskite device and 23.0% summed efficiency for the perovskite/Si tandem device.« less

Efficient semitransparent perovskite solar cells for 23.0%-efficiency perovskite/silicon four-terminal tandem cells

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Bo; Bai, Yang; Yu, Zhengshan

Here, we have investigated semi-transparent perovskite solar cells and infrared enhanced silicon heterojunction cells for high-efficiency tandem devices. A semi-transparent metal electrode with good electrical conductivity and optical transparency has been fabricated by thermal evaporation of 7 nm of Au onto a 1-nm-thick Cu seed layer. For this electrode to reach its full potential, MAPbI3 thin films were formed by a modified one-step spin-coating method, resulting in a smooth layer that allowed the subsequent metal thin film to remain continuous. The fabricated semi-transparent perovskite solar cells demonstrated 16.5% efficiency under one-sun illumination, and were coupled with infrared-enhanced silicon heterojunction cellsmore » tuned specifically for perovskite/Si tandem devices. A double-layer antireflection coating at the front side and MgF2 reflector at rear side of the silicon heterojunction cells reduced parasitic absorption of near-infrared light, leading to 6.5% efficiency after filtering with a perovskite device and 23.0% summed efficiency for the perovskite/Si tandem device.« less

Diamondlike carbon as a moisture barrier and antireflecting coating on optical materials

NASA Technical Reports Server (NTRS)

Woollam, John A.; De, Bhola N.; Chen, L. Y.; Pouch, John J.; Alterovitz, Samuel A.

1990-01-01

Diamondlike carbon (DLC) is amorphous, hard, semitransparent, and is under consideration for use as a coating material for infrared optics. DLC is also designated as a-C:H to indicate its amorphous nature as well as to indicate the presence of large (20 to 55 percent) amounts of hydrogen in the film. Two important questions arise with respect to use of DLC in infrared optics. Will the lack of grain boundaries help to keep moisture from penetrating the film. Secondly, application as an antireflection coating places restrictions on the allowed values of the index of refraction of the film relative to the particular substrate material being used. Will DLC have the correct index range. These two questions are addressed in this paper.

Sol-Gel Processing of MgF2 Antireflective Coatings

PubMed Central

Löbmann, Peer

2018-01-01

There are different approaches for the preparation of porous antireflective λ/4 MgF2 films from liquid precursors. Among these, the non-aqueous fluorolytic synthesis of precursor solutions offers many advantages in terms of processing simplicity and scalability. In this paper, the structural features and optical performance of the resulting films are highlighted, and their specific interactions with different inorganic substrates are discussed. Due to their excellent abrasion resistance, coatings have a high potential for applications on glass. Using solvothermal treatment of precursor solutions, also the processing of thermally sensitive polymer substrates becomes feasible. PMID:29724064

Terahertz Brewster lenses.

PubMed

Wichmann, Matthias; Scherger, Benedikt; Schumann, Steffen; Lippert, Sina; Scheller, Maik; Busch, Stefan F; Jansen, Christian; Koch, Martin

2011-12-05

Typical lenses suffer from Fresnel reflections at their surfaces, reducing the transmitted power and leading to interference phenomena. While antireflection coatings can efficiently suppress these reflections for a small frequency window, broadband antireflection coatings remain challenging. In this paper, we report on the simulation and experimental investigation of Brewster lenses in the THz-range. These lenses can be operated under the Brewster angle, ensuring reflection-free transmission of p-polarized light in an extremely broad spectral range. Experimental proof of the excellent focusing capabilities of the Brewster lenses is given by frequency and spatially resolved focus plane measurements using a fiber-coupled THz-TDS system.

Antireflective coatings for multijunction solar cells under wide-angle ray bundles.

PubMed

Victoria, Marta; Domínguez, César; Antón, Ignacio; Sala, Gabriel

2012-03-26

Two important aspects must be considered when optimizing antireflection coatings (ARCs) for multijunction solar cells to be used in concentrators: the angular light distribution over the cell created by the particular concentration system and the wide spectral bandwidth the solar cell is sensitive to. In this article, a numerical optimization procedure and its results are presented. The potential efficiency enhancement by means of ARC optimization is calculated for several concentrating PV systems. In addition, two methods for ARCs direct characterization are presented. The results of these show that real ARCs slightly underperform theoretical predictions.

Solid state radiative heat pump

DOEpatents

Berdahl, Paul H.

1986-01-01

A solid state radiative heat pump (10, 50, 70) operable at room temperature (300.degree. K.) utilizes a semiconductor having a gap energy in the range of 0.03-0.25 eV and operated reversibly to produce an excess or deficit of charge carriers as compared to thermal equilibrium. In one form of the invention (10, 70) an infrared semiconductor photodiode (21, 71) is used, with forward or reverse bias, to emit an excess or deficit of infrared radiation. In another form of the invention (50), a homogeneous semiconductor (51) is subjected to orthogonal magnetic and electric fields to emit an excess or deficit of infrared radiation. Three methods of enhancing transmission of radiation through the active surface of the semiconductor are disclosed. In one method, an anti-reflection layer (19) is coated into the active surface (13) of the semiconductor (11), the anti-reflection layer (19) having an index of refraction equal to the square root of that of the semiconductor (11). In the second method, a passive layer (75) is spaced from the active surface (73) of the semiconductor (71) by a submicron vacuum gap, the passive layer having an index of refractive equal to that of the semiconductor. In the third method, a coupler (91) with a paraboloid reflecting surface (92) is in contact with the active surface (13, 53) of the semiconductor (11, 51), the coupler having an index of refraction about the same as that of the semiconductor.

Coatings Boost Solar-Cell Outputs

NASA Technical Reports Server (NTRS)

Rohatgi, Ajeet; Campbell, Robert B.; O'Keefe, T. W.; Rai-Choudbury, Posenjit; Hoffman, Richard A.

1988-01-01

Efficiencies increased by more-complete utilization of incident light. Electrical outputs of thin solar photovoltaic cells made of dendritic-web silicon increased by combination of front-surface, antireflective coatings and back-surface, reflective coatings. Improvements achieved recently through theoretical and experimental studies of ways to optimize coatings for particular wavelengths of incident light, cell thicknesses, and cell materials.

Conducting antireflection coatings with low polarization dependent loss for telecommunication applications.

PubMed

Dobrowolski, J; Ford, Joseph; Sullivan, Brian; Lu, Liping; Osborne, Norman

2004-12-13

Conducting optical coatings for the visible light range are commonly made of Indium Tin Oxide (ITO), but ITO is unsuitable for near-infrared telecommunications wavelengths because it can become absorptive after extended illumination. In this paper we show an alternative approach which uses conventional coating materials to create either non-conducting or conducting antireflection (AR) coatings that are effective over a fairly broad spectral region ( lambdalong/lambdashort approximately 1.40) and also usable for a wide range of angles of incidence (0-38 masculine, or 0-55 masculine) in the telecom wavelength range. Not only is the transmittance of windows treated with such coatings quite high, but they can be made to have extreme polarization independence (low polarization dependent loss values). A number of such coating designs are presented in the paper. A prototype of one of the conducting AR coating designs was fabricated and the measurements were found to be in reasonable agreement with the calculated performance. Such AR coatings should be of interest for telecommunication applications and especially for anti-static hermetic packaging of MEMS devices such as optical switches.

Conducting antireflection coatings with low polarization dependent loss for telecommunication applications

NASA Astrophysics Data System (ADS)

Dobrowolski, J. A.; Ford, Joseph E.; Sullivan, Brian T.; Lu, Liping; Osborne, Norman R.

2004-12-01

Conducting optical coatings for the visible light range are commonly made of Indium Tin Oxide (ITO), but ITO is unsuitable for near-infrared telecommunications wavelengths because it can become absorptive after extended illumination. In this paper we show an alternative approach which uses conventional coating materials to create either non-conducting or conducting antireflection (AR) coatings that are effective over a fairly broad spectral region ( λlong/λshort ≈ 1.40) and also usable for a wide range of angles of incidence (0-38°, or 0-55°) in the telecom wavelength range. Not only is the transmittance of windows treated with such coatings quite high, but they can be made to have extreme polarization independence (low polarization dependent loss values). A number of such coating designs are presented in the paper. A prototype of one of the conducting AR coating designs was fabricated and the measurements were found to be in reasonable agreement with the calculated performance. Such AR coatings should be of interest for telecommunication applications and especially for anti-static hermetic packaging of MEMS devices such as optical switches.

Characterization of Silicon Moth-Eye Antireflection Coatings for Astronomical Applications in the Infrared

NASA Astrophysics Data System (ADS)

Jeram, Sarik; Ge, Jian; Jiang, Peng; Phillips, Blayne

2016-01-01

Silicon moth-eye antireflective structures have emerged to be an excellent approachfor reducing the amount of light that is lost upon incidence on a given surface of optics made of silicon. This property has been exploited for a wide variety of products ranging from eyeglasses and flat-panel displays to solar panels. These materials typically come in the form of coatings that are applied to an optical substrate such as glass. Moth-eye coatings, made of a periodic array of subwavelength pillars on silicon substrates or other substrates, can produce the desired antireflection (AR) performance for a broad wavelength range and over a wide range of incident angles. In the field of astronomy, every photon striking a detector is significant - and thus, losses from reflectivity at the various optical interfaces before a detector can have significant implications to the science at hand. Moth-eye AR coatings on these optical interfaces may minimize their reflection losses while maximizing light throughput for a multitude of different astronomical instruments. In addition, moth-eye AR coatings, which are patterned directly on silicon surfaces, can significantly enhance the coating durability. At the University of Florida, we tested two moth-eye filters designed for use in the near-infrared regime at 1-8 microns by examining their optical properties, such as transmission, the scattered light, and wavefront quality, and testing the coatings at cryogenic temperatures to characterize their viability for use in both ground- and space-based infrared instruments. This presentation will report our lab evaluation results.

Low-cost evacuated-tube solar collector

NASA Astrophysics Data System (ADS)

1981-02-01

A prototype design for an evacuated tube air cooled solar collector module was completed. A product cost study, based on the production of 60,000 of the prototype modules per year (approx. 1,000,000 square feet annually), estimates that the module as shipped would have a cost at inventory of $7.09 to $7.40 per square foot of aperture. Computer programs were developed to predict the optical and thermal performane of the module. Antireflective coatings (porous aluminum oxide) formed by spraying or dipping were demonstrated but degraded more rapidly when exposed to a high humidity ambient acid etched films. A selective black chromium oxide multi-layered graded film was vapor deposited which had an absorptivity of about 0.9 and an emissivity of 0.03. When the film was heated to temperatures of 4000 C in a gettered vacuum for as little as 24 hours, however, irreversible changes took place both between and within coating layers which resulted in alpha decreasing to about 0.73 and epsilon increasing to 0.14.

Buffer layer between a planar optical concentrator and a solar cell

DOE Office of Scientific and Technical Information (OSTI.GOV)

Solano, Manuel E.; Barber, Greg D.; Department of Chemistry, Pennsylvania State University, University Park, PA 16802

2015-09-15

The effect of inserting a buffer layer between a periodically multilayered isotropic dielectric (PMLID) material acting as a planar optical concentrator and a photovoltaic solar cell was theoretically investigated. The substitution of the photovoltaic material by a cheaper dielectric material in a large area of the structure could reduce the fabrication costs without significantly reducing the efficiency of the solar cell. Both crystalline silicon (c-Si) and gallium arsenide (GaAs) were considered as the photovoltaic material. We found that the buffer layer can act as an antireflection coating at the interface of the PMLID and the photovoltaic materials, and the structuremore » increases the spectrally averaged electron-hole pair density by 36% for c-Si and 38% for GaAs compared to the structure without buffer layer. Numerical evidence indicates that the optimal structure is robust with respect to small changes in the grating profile.« less

Laser damage initiation and growth of antireflection coated S-FAP crystal surfaces prepared by pitch lap and magnetorheological finishing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Stolz, C J; Menapace, J A; Schaffers, K I

Antireflection (AR) coatings typically damage at the interface between the substrate and coating. Therefore the substrate finishing technology can have an impact on the laser resistance of the coating. For this study, AR coatings were deposited on Yb:S-FAP [Yb{sup 3+}:Sr{sub 5}(PO{sub 4}){sub 3}F] crystals that received a final polish by both conventional pitch lap finishing as well as magnetorheological finishing (MRF). SEM images of the damage morphology reveals laser damage originates at scratches and at substrate coating interfacial absorbing defects. Previous damage stability tests on multilayer mirror coatings and bare surfaces revealed damage growth can occur at fluences below themore » initiation fluence. The results from this study suggest the opposite trend for AR coatings. Investigation of unstable HR and uncoated surface damage morphologies reveals significant radial cracking that is not apparent with AR damage due to AR delamination from the coated surface with few apparent cracks at the damage boundary. Damage stability tests show that coated Yb:S-FAP crystals can operate at 1057 nm at fluences around 20 J/cm{sup 2} at 10 ns; almost twice the initiation damage threshold.« less

Laser damage of HR, AR-coatings, monolayers and bare surfaces at 1064 nm

NASA Technical Reports Server (NTRS)

Garnov, S. V.; Klimentov, S. M.; Said, A. A.; Soileau, M. J.

1993-01-01

Laser induced damage thresholds and morphologies were investigated in a variety of uncoated and coated surfaces, including monolayers and multi-layers of different chemical compositions. Both antireflective (AR) and highly reflective (HR) were tested. Testing was done at 1064 nm with 25 picosecond and 8 nanosecond YAG/Nd laser single pulses. Spot diameter in the experiments varied from 0.09 to 0.22 mm. The laser damage measurement procedure consisted of 1-on-1 (single laser pulse in the selected site) and N-on-1 experiments including repeated irradiation by pulses of the same fluence and subsequently raised from pulse to pulse fluence until damage occurred. The highest picosecond damage thresholds of commercially available coatings averaged 12 - 14 J/sq cm, 50 percent less than thresholds obtained in bare fused silica. Some coatings and bare surfaces revealed a palpable preconditioning effect (an increase in threshold of 1.2 to 1.8 times). Picosecond and nanosecond data were compared to draw conclusions about pulse width dependence. An attempt was made to classify damage morphologies according to the type of coating, class of irradiating, and damage level.

Composite films prepared by plasma ion-assisted deposition (IAD) for design and fabrication of antireflection coatings in visible and near-infrared spectral regions

NASA Astrophysics Data System (ADS)

Tsai, Rung-Ywan; Ho, Fang C.

1994-11-01

Ion-assisted deposition (IAD) processes configured with a well-controlled plasma source at the center base of a vacuum chamber, which accommodates two independent e-gun sources, is used to deposition TiO2MgF2 and TiO2-SiO2 composite films of selected component ratios. Films prepared by this technology are found durable, uniform, and nonabsorbing in visible and near-IR regions. Single- and multilayer antireflection coatings with refractive index from 1.38 to 2.36 at (lambda) equals 550 nm are presented. Methods of enhancement in optical performance of these coatings are studied. The advantages of AR coatings formed by TiO2-MgF2 composite films over those similar systems consisting of TiO2-SiO2 composite films in both visible and near-IR regions are also presented.

Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC resist interface

NASA Astrophysics Data System (ADS)

Lenhart, Joseph L.; Fischer, Daniel; Sambasivan, Sharadha; Lin, Eric K.; Wu, Wen-Li; Guerrero, Douglas J.; Wang, Yubao; Puligadda, Rama

2007-02-01

Interactions between a bottom anti-reflective coating (BARC) and a photoresist can critically impact lithographic patterns. For example, a lithographic pattern can shrink or spread near a BARC interface, a process called undercutting or footing respectively, due to incompatibility between the two materials. Experiments were conducted on two industrial BARC coatings in an effort to determine the impact of BARC surface chemistry on the footing and undercutting phenomena. The BARC coatings were characterized by near edge X-ray absorption fine structure (NEXAFS), contact angle measurements, and neutron and X-ray reflectivity. Contact angle measurement using a variety of fluids showed that the fluid contact angles were independent of the type of BARC coating or the BARC processing temperature. NEXAFS measurements showed that the surface chemistry of each BARC was also independent of the processing temperature. These results suggest that acid-base interactions at the BARC-resist interface are not the cause of the footing-undercutting phenomena encountered in lithographic patterns.

Development of processing procedures for advanced silicon solar cells. [antireflection coatings and short circuit currents

NASA Technical Reports Server (NTRS)

Scott-Monck, J. A.; Stella, P. M.; Avery, J. E.

1975-01-01

Ten ohm-cm silicon solar cells, 0.2 mm thick, were produced with short circuit current efficiencies up to thirteen percent and using a combination of recent technical advances. The cells were fabricated in conventional and wraparound contact configurations. Improvement in cell collection efficiency from both the short and long wavelengths region of the solar spectrum was obtained by coupling a shallow junction and an optically transparent antireflection coating with back surface field technology. Both boron diffusion and aluminum alloying techniques were evaluated for forming back surface field cells. The latter method is less complicated and is compatible with wraparound cell processing.

[Study on the preparation and properties of novel silica microporous antireflective coating by sol-gel process].

PubMed

Shang, Meng-Ying; Cao, Lin-Hong; Liu, Miao; Luo, Xuan; Ren, Hong-Bo; Ye, Xin; Tang, Yong-Jian; Jiang, Xiao-Dong

2013-04-01

Silica sol was prepared by acid catalyzed sol-gel process using tetraethylorthosilicate (TEOS) as precursor and dimethyldietoxysilane (DDS) as pore-forming agent. A novel kind of monolayer microporous silica anti-reflective (AR) coating was obtained on K9 glass substrate by dip-coating technique and then heat treated at 500 degrees C. The effects of different DDS/TEOS molar ratios on refractive index, transmittance and hardness were investigated. A positive correlation was found between the transmittance and the DDS/TEOS molar ratio due to the increasing porosity. The maximum transmittance can reach 99.7% with the molar ratio of DDS/TEOS rising to 1 : 1. Meanwhile, the refractive index was found quite close to the ideal value 1.22. Nevertheless, higher molar ratio will lead to a bad film-forming property. On the other hand, the hardness of the coatings decreased with the DDS increasing but still remained more than 2 h when the transmittance reached highest. Besides, these coatings exhibit a well abrasion-resistance and excellent adhesivity. The maximum transmittance was only dropped by 0.071% and 0.112% after abrasion for 500 and 1 000 times respectively. Accelerated corrosion tests indicated that the transmittance of traditional coatings rapidly fell down to the substrate level (-92%) after immersion for 5 min, while the transmittance of our novel coating almost linearly decreased and was kept 93.2% after 56 min. In other words, the environment-resistance of our novel silica AR coating is ten times higher than that of traditional ones. The promotions of the coating performances benefit from its micropore structure (-0. 4 nm) with which water molecule can be effectively prevented. With its high transmittance, good mechanical properties and high environment-resistance, this kind of novel coating has a potential application in the field of solar glass modification to improve its anti-reflective properties.

A theoretical analysis of the current-voltage characteristics of solar cells. [and their energy conversion efficiency

NASA Technical Reports Server (NTRS)

Dunbar, P. M.; Hauser, J. R.

1976-01-01

Various mechanisms which limit the conversion efficiency of silicon solar cells were studied. The effects of changes in solar cell geometry such as layer thickness on performance were examined. The effects of various antireflecting layers were also examined. It was found that any single film antireflecting layer results in a significant surface loss of photons. The use of surface texturing techniques or low loss antireflecting layers can enhance by several percentage points the conversion efficiency of silicon cells. The basic differences between n(+)-p-p(+) and p(+)-n-n(+) cells are treated. A significant part of the study was devoted to the importance of surface region lifetime and heavy doping effects on efficiency. Heavy doping bandgap reduction effects are enhanced by low surface layer lifetimes, and conversely, the reduction in solar cell efficiency due to low surface layer lifetime is further enhanced by heavy doping effects. A series of computer studies is reported which seeks to determine the best cell structure and doping levels for maximum efficiency.

Characterization of nanoscopic calcium fluoride films

NASA Astrophysics Data System (ADS)

Rehmer, A.; Kemnitz, E.

2016-09-01

Nano metal fluorides are appropriate materials for different applications e.g. heterogeneous catalysis, ceramic materials for laser applications and antireflective layers on glass, respectively. An easy way to synthesize such nano metal fluorides is the fluorolytic sol-gel synthesis which was developed some few years ago for HS-AlF3 [1] and MgF2.[2] CaF2 exhibits similar optical properties as MgF2, and thus, is a promising candidate for antireflective (AR) coatings. That means, CaF2 exhibits a lower refractive index (n500 = 1.44) as compared to common soda lime glass (n500 = 1.53). Hence, we present an easy synthesis approach toward nanoscaled CaF2 sols to fabricate finally AR-CaF2 films by dip coating. Irrespective of the choice of the calcium precursor, the CaF2 films are porous in comparison to thin dense CaF2 films which are generated by physical vapor deposition. The characterization of CaF2 films was performed by different analytical methods like HR-SEM, XPS, EDX, EP (ellipsometric porosimetry), DLS (dynamic light scattering) and CA (contact angle measurement). Beside the good optical and mechanical properties, we have investigated the surface properties of CaF2 films on glass and silicon wafer e.g. surface morphology with elemental composition, open porosity, zeta potentials at the surfaces as well as the free energy of interaction between water and the CaF2 film.

New generation all-silica based optical elements for high power laser systems

NASA Astrophysics Data System (ADS)

Tolenis, T.; GrinevičiÅ«tÄ--, L.; Melninkaitis, A.; Selskis, A.; Buzelis, R.; MažulÄ--, L.; Drazdys, R.

2017-08-01

Laser resistance of optical elements is one of the major topics in photonics. Various routes have been taken to improve optical coatings, including, but not limited by, materials engineering and optimisation of electric field distribution in multilayers. During the decades of research, it was found, that high band-gap materials, such as silica, are highly resistant to laser light. Unfortunately, only the production of anti-reflection coatings of all-silica materials are presented to this day. A novel route will be presented in materials engineering, capable to manufacture high reflection optical elements using only SiO2 material and GLancing Angle Deposition (GLAD) method. The technique involves the deposition of columnar structure and tailoring the refractive index of silica material throughout the coating thickness. A numerous analysis indicate the superior properties of GLAD coatings when compared with standard methods for Bragg mirrors production. Several groups of optical components are presented including anti-reflection coatings and Bragg mirrors. Structural and optical characterisation of the method have been performed and compared with standard methods. All researches indicate the possibility of new generation coatings for high power laser systems.

Anti- reflective device having an anti-reflection surface formed of silicon spikes with nano-tips

NASA Technical Reports Server (NTRS)

Bae, Youngsman (Inventor); Mooasser, Sohrab (Inventor); Manohara, Harish (Inventor); Lee, Choonsup (Inventor); Bae, Kungsam (Inventor)

2009-01-01

Described is a device having an anti-reflection surface. The device comprises a silicon substrate with a plurality of silicon spikes formed on the substrate. A first metallic layer is formed on the silicon spikes to form the anti-reflection surface. The device further includes an aperture that extends through the substrate. A second metallic layer is formed on the substrate. The second metallic layer includes a hole that is aligned with the aperture. A spacer is attached with the silicon substrate to provide a gap between an attached sensor apparatus. Therefore, operating as a Micro-sun sensor, light entering the hole passes through the aperture to be sensed by the sensor apparatus. Additionally, light reflected by the sensor apparatus toward the first side of the silicon substrate is absorbed by the first metallic layer and silicon spikes and is thereby prevented from being reflected back toward the sensor apparatus.

High durability antireflection coatings for silicon and multispectral ZnS

NASA Astrophysics Data System (ADS)

Joseph, Shay; Marcovitch, Orna; Yadin, Ygal; Klaiman, Dror; Koren, Nitzan; Zipin, Hedva

2007-04-01

In the current complex battle field, military platforms are required to operate on land, at sea and in the air in all weather conditions both day and night. In order to achieve such capabilities, advanced electro-optical systems are being constantly developed and improved. These systems such as missile seeker heads, reconnaissance and target acquisition pods and tracking, monitoring and alert systems have external optical components (window or dome) which must remain operational even at extreme environmental conditions. Depending on the intended use of the system, there are a few choices of window and dome materials. Amongst the more common materials one can point out sapphire, ZnS, germanium and silicon. Other materials such as spinel, ALON and yittria may also be considered. Most infrared materials have high indices of refraction and therefore they reflect a large part of radiation. To minimize the reflection and increase the transmission, antireflection (AR) coatings are the most common choice. Since these systems operate at different environments and weather conditions, the coatings must be made durable to withstand these extreme conditions. In cases where the window or dome is made of relatively soft materials such as multispectral ZnS, the coating may also serve as protection for the window or dome. In this work, several antireflection coatings have been designed and manufactured for silicon and multispectral ZnS. The coating materials were chosen to be either oxides or fluorides which are known to have high durability. Ellipsometry measurements were used to characterize the optical constants of the thin films. The effects of the deposition conditions on the optical constants of the deposited thin films and durability of the coatings will be discussed. The coatings were tested according to MIL-STD-810E and were also subjected to rain erosion tests at the University of Dayton Research Institute (UDRI) whirling arm apparatus in which one of the coatings showed no rain drop impact damage at all.

Tunable, flexible antireflection layer of ZnO nanowires embedded in PDMS.

PubMed

Kim, Min Kyu; Yi, Dong Kee; Paik, Ungyu

2010-05-18

In this article, we report the fabrication of ordered hybrid structures composed of ZnO nanowires and a polymeric matrix with a polymer precursor infiltrating the nanowire arrays. The antireflective properties of the resulting ZnO nanowire-embedded polydimethylsiloxane composite (ZPC) were investigated at various ZnO nanowire lengths and ZPC bending angles. Interestingly, we found that whereas the antireflective properties showed a strong dependence on the length of the embedded ZnO nanowires in PDMS, the bending of ZPC has little effect on the antireflective properties.

Antireflective surface structures in glass by self-assembly of SiO2 nanoparticles and wet etching.

PubMed

Maier, Thomas; Bach, David; Müllner, Paul; Hainberger, Rainer; Brückl, Hubert

2013-08-26

We describe the fabrication of an antireflective surface structure with sub-wavelength dimensions on a glass surface using scalable low-cost techniques involving sol-gel coating, thermal annealing, and wet chemical etching. The glass surface structure consists of sand dune like protrusions with 250 nm periodicity and a maximum peak-to-valley height of 120 nm. The antireflective structure increases the transmission of the glass up to 0.9% at 700 nm, and the transmission remains enhanced over a wide spectral range and for a wide range of incident angles. Our measurements reveal a strong polarization dependence of the transmission change.

Fabrication of artificially stacked ultrathin ZnS/MgF2 multilayer dielectric optical filters.

PubMed

Kedawat, Garima; Srivastava, Subodh; Jain, Vipin Kumar; Kumar, Pawan; Kataria, Vanjula; Agrawal, Yogyata; Gupta, Bipin Kumar; Vijay, Yogesh K

2013-06-12

We report a design and fabrication strategy for creating an artificially stacked multilayered optical filters using a thermal evaporation technique. We have selectively chosen a zinc sulphide (ZnS) lattice for the high refractive index (n = 2.35) layer and a magnesium fluoride (MgF2) lattice as the low refractive index (n = 1.38) layer. Furthermore, the microstructures of the ZnS/MgF2 multilayer films are also investigated through TEM and HRTEM imaging. The fabricated filters consist of high and low refractive 7 and 13 alternating layers, which exhibit a reflectance of 89.60% and 99%, respectively. The optical microcavity achieved an average transmittance of 85.13% within the visible range. The obtained results suggest that these filters could be an exceptional choice for next-generation antireflection coatings, high-reflection mirrors, and polarized interference filters.

Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles

PubMed Central

2014-01-01

We report the fabrication of broadband antireflective silicon (Si) nanostructures fabricated using spin-coated silver (Ag) nanoparticles as an etch mask followed by inductively coupled plasma (ICP) etching process. This fabrication technique is a simple, fast, cost-effective, and high-throughput method, making it highly suitable for mass production. Prior to the fabrication of Si nanostructures, theoretical investigations were carried out using a rigorous coupled-wave analysis method in order to determine the effects of variations in the geometrical features of Si nanostructures to obtain antireflection over a broad wavelength range. The Ag ink ratio and ICP etching conditions, which can affect the distribution, distance between the adjacent nanostructures, and height of the resulting Si nanostructures, were carefully adjusted to determine the optimal experimental conditions for obtaining desirable Si nanostructures for practical applications. The Si nanostructures fabricated using the optimal experimental conditions showed a very low average reflectance of 8.3%, which is much lower than that of bulk Si (36.8%), as well as a very low reflectance for a wide range of incident angles and different polarizations over a broad wavelength range of 300 to 1,100 nm. These results indicate that the fabrication technique is highly beneficial to produce antireflective structures for Si-based device applications requiring low light reflection. PMID:24484636

Single Photon Counting UV Solar-Blind Detectors Using Silicon and III-Nitride Materials

PubMed Central

Nikzad, Shouleh; Hoenk, Michael; Jewell, April D.; Hennessy, John J.; Carver, Alexander G.; Jones, Todd J.; Goodsall, Timothy M.; Hamden, Erika T.; Suvarna, Puneet; Bulmer, J.; Shahedipour-Sandvik, F.; Charbon, Edoardo; Padmanabhan, Preethi; Hancock, Bruce; Bell, L. Douglas

2016-01-01

Ultraviolet (UV) studies in astronomy, cosmology, planetary studies, biological and medical applications often require precision detection of faint objects and in many cases require photon-counting detection. We present an overview of two approaches for achieving photon counting in the UV. The first approach involves UV enhancement of photon-counting silicon detectors, including electron multiplying charge-coupled devices and avalanche photodiodes. The approach used here employs molecular beam epitaxy for delta doping and superlattice doping for surface passivation and high UV quantum efficiency. Additional UV enhancements include antireflection (AR) and solar-blind UV bandpass coatings prepared by atomic layer deposition. Quantum efficiency (QE) measurements show QE > 50% in the 100–300 nm range for detectors with simple AR coatings, and QE ≅ 80% at ~206 nm has been shown when more complex AR coatings are used. The second approach is based on avalanche photodiodes in III-nitride materials with high QE and intrinsic solar blindness. PMID:27338399

Single Photon Counting UV Solar-Blind Detectors Using Silicon and III-Nitride Materials.

PubMed

Nikzad, Shouleh; Hoenk, Michael; Jewell, April D; Hennessy, John J; Carver, Alexander G; Jones, Todd J; Goodsall, Timothy M; Hamden, Erika T; Suvarna, Puneet; Bulmer, J; Shahedipour-Sandvik, F; Charbon, Edoardo; Padmanabhan, Preethi; Hancock, Bruce; Bell, L Douglas

2016-06-21

Ultraviolet (UV) studies in astronomy, cosmology, planetary studies, biological and medical applications often require precision detection of faint objects and in many cases require photon-counting detection. We present an overview of two approaches for achieving photon counting in the UV. The first approach involves UV enhancement of photon-counting silicon detectors, including electron multiplying charge-coupled devices and avalanche photodiodes. The approach used here employs molecular beam epitaxy for delta doping and superlattice doping for surface passivation and high UV quantum efficiency. Additional UV enhancements include antireflection (AR) and solar-blind UV bandpass coatings prepared by atomic layer deposition. Quantum efficiency (QE) measurements show QE > 50% in the 100-300 nm range for detectors with simple AR coatings, and QE ≅ 80% at ~206 nm has been shown when more complex AR coatings are used. The second approach is based on avalanche photodiodes in III-nitride materials with high QE and intrinsic solar blindness.

Biomimetic Moth-eye Nanofabrication: Enhanced Antireflection with Superior Self-cleaning Characteristic.

PubMed

Sun, Jingyao; Wang, Xiaobing; Wu, Jinghua; Jiang, Chong; Shen, Jingjing; Cooper, Merideth A; Zheng, Xiuting; Liu, Ying; Yang, Zhaogang; Wu, Daming

2018-04-03

Sub-wavelength antireflection moth-eye structures were fabricated with Nickel mold using Roll-to-Plate (R2P) ultraviolet nanoimprint lithography (UV-NIL) on transparent polycarbonate (PC) substrates. Samples with well replicated patterns established an average reflection of 1.21% in the visible light range, 380 to 760 nm, at normal incidence. An excellent antireflection property of a wide range of incidence angles was shown with the average reflection below 4% at 50°. Compared with the unpatterned ultraviolet-curable resin coating, the resulting sub-wavelength moth-eye structure also exhibited increased hydrophobicity in addition to antireflection. This R2P method is especially suitable for large-area product preparation and the biomimetic moth-eye structure with multiple performances can be applied to optical devices such as display screens, solar cells, or light emitting diodes.

Effective light absorption and its enhancement factor for silicon nanowire-based solar cell.

PubMed

Duan, Zhiqiang; Li, Meicheng; Mwenya, Trevor; Fu, Pengfei; Li, Yingfeng; Song, Dandan

2016-01-01

Although nanowire (NW) antireflection coating can enhance light trapping capability, which is generally used in crystal silicon (CS) based solar cells, whether it can improve light absorption in the CS body depends on the NW geometrical shape and their geometrical parameters. In order to conveniently compare with the bare silicon, two enhancement factors E(T) and E(A) are defined and introduced to quantitatively evaluate the efficient light trapping capability of NW antireflective layer and the effective light absorption capability of CS body. Five different shapes (cylindrical, truncated conical, convex conical, conical, and concave conical) of silicon NW arrays arranged in a square are studied, and the theoretical results indicate that excellent light trapping does not mean more light can be absorbed in the CS body. The convex conical NW has the best light trapping, but the concave conical NW has the best effective light absorption. Furthermore, if the cross section of silicon NW is changed into a square, both light trapping and effective light absorption are enhanced, and the Eiffel Tower shaped NW arrays have optimal effective light absorption.

Indium-tin-oxide nanowhiskers crystalline silicon photovoltaics combining micro- and nano-scale surface textures

NASA Astrophysics Data System (ADS)

Chang, C. H.; Hsu, M. H.; Chang, W. L.; Sun, W. C.; Yu, Peichen

2011-02-01

In this work, we present a solution that employs combined micro- and nano-scale surface textures to increase light harvesting in the near infrared for crystalline silicon photovoltaics, and discuss the associated antireflection and scattering mechanisms. The combined surface textures are achieved by uniformly depositing a layer of indium-tin-oxide nanowhiskers on passivated, micro-grooved silicon solar cells using electron-beam evaporation. The nanowhiskers facilitate optical transmission in the near-infrared, which is optically equivalent to a stack of two dielectric thin-films with step- and graded- refractive index profiles. The ITO nanowhiskers provide broadband anti-reflective properties (R<5%) in the wavelength range of 350-1100nm. In comparison with conventional Si solar cell, the combined surface texture solar cell shows higher external quantum efficiency (EQE) in the range of 700-1100nm. Moreover, the ITO nano-whisker coating Si solar cell shows a high total efficiency increase of 1.1% (from 16.08% to17.18%). Furthermore, the nano-whiskers also provide strong forward scattering for ultraviolet and visible light, favorable in thin-wafer silicon photovoltaics to increase the optical absorption path.

Single mode terahertz quantum cascade amplifier

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ren, Y., E-mail: yr235@cam.ac.uk; Wallis, R.; Shah, Y. D.

2014-10-06

A terahertz (THz) optical amplifier based on a 2.9 THz quantum cascade laser (QCL) structure has been demonstrated. By depositing an antireflective coating on the QCL facet, the laser mirror losses are enhanced to fully suppress the lasing action, creating a THz quantum cascade (QC) amplifier. Terahertz radiation amplification has been obtained, by coupling a separate multi-mode THz QCL of the same active region design to the QC amplifier. A bare cavity gain is achieved and shows excellent agreement with the lasing spectrum from the original QCL without the antireflective coating. Furthermore, a maximum optical gain of ∼30 dB with single-modemore » radiation output is demonstrated.« less

Optimized 2D array of thin silicon pillars for efficient antireflective coatings in the visible spectrum

PubMed Central

Proust, Julien; Fehrembach, Anne-Laure; Bedu, Frédéric; Ozerov, Igor; Bonod, Nicolas

2016-01-01

Light reflection occuring at the surface of silicon wafers is drastically diminished by etching square pillars of height 110 nm and width 140 nm separated by a 100 nm gap distance in a square lattice. The design of the nanostructure is optimized to widen the spectral tolerance of the antireflective coatings over the visible spectrum for both fundamental polarizations. Angle and polarized resolved optical measurements report a light reflection remaining under 5% when averaged in the visible spectrum for both polarizations in a wide angular range. Light reflection remains almost insensitive to the light polarization even in oblique incidence. PMID:27109643

Antireflection-coated blue GaN laser diodes in an external cavity and Doppler-free indium absorption spectroscopy.

PubMed

Hildebrandt, Lars; Knispel, Richard; Stry, Sandra; Sacher, Joachim R; Schael, Frank

2003-04-20

Commercially available GaN-based laser diodes were antireflection coated in our laboratory and operated in an external cavity in a Littrow configuration. A total tuning range of typically 4 nm and an optical output power of up to 30 mW were observed after optimization of the external cavity. The linewidth was measured with a beterodyne technique, and 0.8 MHz at a sweep time of 50 ms was obtained. The mode-hop-free tuning range was more than 50 GHz. We demonstrated the performance of the laser by detecting the saturated absorption spectrum of atomic indium at 410 nm, allowing observation of well-resolved Lamb dips.

Note: Sensitive fluorescence detection through minimizing the scattering light by anti-reflective nanostructured materials

NASA Astrophysics Data System (ADS)

Xu, Supeng; Yin, Yanning; Gu, Ruoxi; Xia, Meng; Xu, Liang; Chen, Li; Xia, Yong; Yin, Jianping

2018-04-01

We demonstrate a new approach with fabrication of anti-reflective coating to substantially reduce the scattering light in an ultra-high vacuum during laser induced fluorescence (LIF) detection. To do so, the surface of the vacuum chamber in the detection region was blackened and coated with the special solar heat absorbing nanomaterials. We demonstrate that more than 97.5% of the stray light in the chamber spanning from near infrared to ultraviolet can be absorbed which effectively improves the signal to noise (S/N) ratio. With this technique, the LIF signal from the cold magnesium monofluoride molecules has been observed with an S/N ratio of ˜4 times better than without that.

The effects of the bottom anti-reflective coating with different baked temperatures and thicknesses on nanoscale patterns

NASA Astrophysics Data System (ADS)

Zheng, Jie; Li, Ling; Chen, Weidong

2015-12-01

The bottom anti-reflective coating (BARC) material can enhance the resolution of the nanopatterns structures in laser interference lithography process. In this study, WIDE-B ARC material was investigated to confirm the reduction of the vertical standing wave which leads to defect of nanopatterns. And the critical dimension (CD) of 100 nm L/S patterns with and without the application of BARC material was fabricated by laser interference lithography technology. The compared results showed that BARC can effectively reduce CD swing and obtain more uniform nanopatterns. Meanwhile, we also verified the influence of cured temperature and film thickness of BARC on the uniformity of nanopatterns.

Space qualification of IR-reflecting coverslides for GaAs solar cells

NASA Technical Reports Server (NTRS)

Meulenberg, Andrew

1995-01-01

Improvements to GaAs solar array performance, from the use on solar cell coverslides of several reflecting coatings that reject unusable portions of the solar spectrum, are quantified. Blue-red-rejection (BRR) coverslides provide both infrared reflection (IRR) and ultraviolet rejection (UVR). BRR coverslides were compared to conventional antireflection (AR) and ultraviolet (UV) coated coverslides. A 2% improvement in peak-power output, relative to that from Ar-coated coverslides, is seen for cells utilizing BRR coverslides with the widest bandpass. Coverslide BRR-filter bandpass width and covered-solar-cell short-circuit current is a function of incident light angle and the observed narrower-bandpass filters are more sensitive to change in angle from the normal than are wide-bandpass filters. The first long-term (3000 hours) UV testing of unirradiated and 1 MeV electron-irradiated GaAs solar cells, with multilayer-coated coverslides to reduce solar array operating temperature, has indicated that all multilayer coatings on coverslides and solar cells will experience degradation from the space environment (UV and/or electrons). Five types of coverslide coatings, designed for GaAs solar cells, were tested as part of a NASA-sponsored space-flight qualification for BRR, multi-layer-coated, coverslides. The reponse to the different radiations varied with the coatings. The extent of degradation and its consequences on the solar cell electrical characteristics depend upon the coatings and the radiation. In some cases, an improved optical coupling was observed during long-term UV exposure to the optical stack. The benefits of multi-layered solar cell optics may depend upon both the duration and the radiation environment of a mission.

The DUV Stability of Superlattice-Doped CMOS Detector Arrays

NASA Technical Reports Server (NTRS)

Hoenk, M. E.; Carver, A. G.; Jones, T.; Dickie, M.; Cheng, P.; Greer, H. F.; Nikzad, S.; Sgro, J.; Tsur, S.

2013-01-01

JPL and Alacron have recently developed a high performance, DUV camera with a superlattice doped CMOS imaging detector. Supperlattice doped detectors achieve nearly 100% internal quantum efficiency in the deep and far ultraviolet, and a single layer, Al2O3 antireflection coating enables 64% external quantum efficiency at 263nm. In lifetime tests performed at Applied Materials using 263 nm pulsed, solid state and 193 nm pulsed excimer laser, the quantum efficiency and dark current of the JPL/Alacron camera remained stable to better than 1% precision during long-term exposure to several billion laser pulses, with no measurable degradation, no blooming and no image memory at 1000 fps.

Efficiency improvement of silicon solar cells enabled by ZnO nanowhisker array coating

PubMed Central

2012-01-01

An efficient antireflection coating is critical for the improvement of silicon solar cell performance via increased light coupling. Here, we have grown well-aligned ZnO nanowhisker (NW) arrays on Czochralski silicon solar cells by a seeding-growth two-step process. It is found that the ZnO NWs have a great effect on the macroscopic antireflection effect and, therefore, improves the solar cell performance. The ZnO NW array-coated solar cells display a broadband reflection suppression from 500 to 1,100 nm, and the minimum reflectance smaller than 3% can easily be achieved. By optimizing the time of ZnO NW growth, it has been confirmed that an increase of 3% relatively in the solar cell efficiency can be obtained. These results are quite interesting for the application of ZnO nanostructure in the fabrication of high-efficiency silicon solar cells. PMID:22704578

The role of random nanostructures for the omnidirectional anti-reflection properties of the glasswing butterfly.

PubMed

Siddique, Radwanul Hasan; Gomard, Guillaume; Hölscher, Hendrik

2015-04-22

The glasswing butterfly (Greta oto) has, as its name suggests, transparent wings with remarkable low haze and reflectance over the whole visible spectral range even for large view angles of 80°. This omnidirectional anti-reflection behaviour is caused by small nanopillars covering the transparent regions of its wings. In difference to other anti-reflection coatings found in nature, these pillars are irregularly arranged and feature a random height and width distribution. Here we simulate the optical properties with the effective medium theory and transfer matrix method and show that the random height distribution of pillars significantly reduces the reflection not only for normal incidence but also for high view angles.

The role of random nanostructures for the omnidirectional anti-reflection properties of the glasswing butterfly

NASA Astrophysics Data System (ADS)

Siddique, Radwanul Hasan; Gomard, Guillaume; Hölscher, Hendrik

2015-04-01

The glasswing butterfly (Greta oto) has, as its name suggests, transparent wings with remarkable low haze and reflectance over the whole visible spectral range even for large view angles of 80°. This omnidirectional anti-reflection behaviour is caused by small nanopillars covering the transparent regions of its wings. In difference to other anti-reflection coatings found in nature, these pillars are irregularly arranged and feature a random height and width distribution. Here we simulate the optical properties with the effective medium theory and transfer matrix method and show that the random height distribution of pillars significantly reduces the reflection not only for normal incidence but also for high view angles.

High performance, inexpensive solar cell process capable of a high degree of automation

NASA Technical Reports Server (NTRS)

Shah, P.; Fuller, C. R.

1976-01-01

This paper proposes a process for inexpensive high performance solar cell fabrication that can be automated for further cost reduction and higher throughputs. The unique feature of the process is the use of oxides as doping sources for simultaneous n(+) junction formation and back p(+) layer, as a mask for metallization and as an in situ AR coating for spectrum matching. Cost analysis is performed to show that significant cost reductions over the conventional process is possible using the proposed scheme and the cost intensive steps are identified which can be further reduced to make the process compatible with the needed price goals of 50 cents/watt. The process was demonstrated by fabricating n(+)-p cells using Arsenic doped oxides. Simple n(+)-p structure cells showed corrected efficiencies of 14.5% (AMO) and 12% with doped oxide as an in situ antireflection coating.

ZnS thin films deposition by thermal evaporation for photovoltaic applications

NASA Astrophysics Data System (ADS)

Benyahia, K.; Benhaya, A.; Aida, M. S.

2015-10-01

ZnS thin films were deposited on glass substrates by thermal evaporation from millimetric crystals of ZnS. The structural, compositional and optical properties of the films are studied by X-ray diffraction, SEM microscopy, and UV-VIS spectroscopy. The obtained results show that the films are pin hole free and have a cubic zinc blend structure with (111) preferential orientation. The estimated optical band gap is 3.5 eV and the refractive index in the visible wavelength ranges from 2.5 to 1.8. The good cubic structure obtained for thin layers enabled us to conclude that the prepared ZnS films may have application as buffer layer in replacement of the harmful CdS in CIGS thin film solar cells or as an antireflection coating in silicon-based solar cells.

Light-scattering measurements of optical thin-film components at 157 and 193 nm

NASA Astrophysics Data System (ADS)

Gliech, Stefan; Steinert, Jorg; Duparre, Angela

2002-06-01

An instrument for total backscattering and forward-scattering measurements of optical coating components at 157 and 193 nm is described. The system is operated in both vacuum and nitrogen purge gas. An excimer laser as well as a deuterium lamp can be used as a radiation source. Suppression of the background signal level to 1 part in 106 permits measurements even of low-scatter samples such as superpolished substrates and antireflection coatings. Results of investigations of antireflective and highly reflective multilayers and CaF2 substrates reveal scattering from surface and interface roughness as well as from the volume of the substrate material. First steps to extend the instrument for angle-resolved scatter, transmittance, and reflectance measurements are described.

Self-organized, effective medium black silicon antireflection structures for silicon optics in the mid-infrared

NASA Astrophysics Data System (ADS)

Steglich, Martin; Käsebier, Thomas; Kley, Ernst-Bernhard; Tünnermann, Andreas

2016-09-01

Thanks to its high quality and low cost, silicon is the material of choice for optical devices operating in the mid-infrared (MIR; 2 μm to 6 μm wavelength). Unfortunately in this spectral region, the refractive index is comparably high (about 3.5) and leads to severe reflection losses of about 30% per interface. In this work, we demonstrate that self-organized, statistical Black Silicon structures, fabricated by Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE), can be used to effectively suppress interface reflection. More importantly, it is shown that antireflection can be achieved in an image-preserving, non-scattering way. This enables Black Silicon antireflection structures (ARS) for imaging applications in the MIR. It is demonstrated that specular transmittances of 97% can be easily achieved on both flat and curved substrates, e.g. lenses. Moreover, by a combined optical and morphological analysis of a multitude of different Black Silicon ARS, an effective medium criterion for the examined structures is derived that can also be used as a design rule for maximizing sample transmittance in a desired wavelength range. In addition, we show that the mechanical durability of the structures can be greatly enhanced by coating with hard dielectric materials like diamond-like carbon (DLC), hence enabling practical applications. Finally, the distinct advantages of statistical Black Silicon ARS over conventional AR layer stacks are discussed: simple applicability to topological substrates, absence of thermal stress and cost-effectiveness.

Thermal radiative properties: Coatings.

NASA Technical Reports Server (NTRS)

Touloukian, Y. S.; Dewitt, D. P.; Hernicz, R. S.

1972-01-01

This volume consists, for the most part, of a presentation of numerical data compiled over the years in a most comprehensive manner on coatings for all applications, in particular, thermal control. After a moderately detailed discussion of the theoretical nature of the thermal radiative properties of coatings, together with an overview of predictive procedures and recognized experimental techniques, extensive numerical data on the thermal radiative properties of pigmented, contact, and conversion coatings are presented. These data cover metallic and nonmetallic pigmented coatings, enamels, metallic and nonmetallic contact coatings, antireflection coatings, resin coatings, metallic black coatings, and anodized and oxidized conversion coatings.

Rapid replication and facile modulation of subwavelength antireflective polymer film using injection nanomolding and optical property of multilayer coatings

PubMed Central

2013-01-01

A rapid, cost-effective and high-throughput process for nanotexturing subwavelength structures with high uniformity using the polycarbonate (PC) is realized via injection nanomolding. The process enables the precise control of nanohole array (NHA) surface topography (nanohole depth, diameter, and periodicity) over large areas thereby presenting a highly versatile platform for fabricating substrates with user-defined, functional performance. Specifically, the optical property of the PC substrates were systematically characterized and tuned through the modulation of the depths of NHA. The aspect ratio submicron holes can be easily modulated and experimentally proven by simply adjusting the molding temperature. The nanotextured depths were reliably fabricated in the range of 200 to 400 nm with a period of approximately 700 nm. The fabricated PC films can reduce the reflectivity from an original bare film of 10.2% and 8.9% to 1.4% and 2.1% with 400-nm depth of nanoholes at the wavelength of 400 and 550 nm, respectively. Compared with conventional moth-like nanostructures with nanopillar arrays with heights adjustable only by an etching process, this paper proposes a facile route with submicron holes to achieve a similar antireflective function, with a significantly reduced time and facile height modulation capability. Furthermore, the effects of multilayer coatings of dielectric and metallic layers on the nanomolded NHA have been performed and potential sensing application is explored. PMID:24088185

Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement

NASA Astrophysics Data System (ADS)

Otani, Minoru; Biro, Ryuji; Ouchi, Chidane; Hasegawa, Masanobu; Suzuki, Yasuyuki; Sone, Kazuho; Niisaka, Shunsuke; Saito, Tadahiko; Saito, Jun; Tanaka, Akira

2002-06-01

The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor's coating design by that vendor's coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.

Development of nanostructured antireflection coatings for infrared technologies and applications

NASA Astrophysics Data System (ADS)

Pethuraja, Gopal G.; Zeller, John W.; Welser, Roger E.; Efstathiadis, Harry; Haldar, Pradeep; Wijewarnasuriya, Priyalal S.; Dhar, Nibir K.; Sood, Ashok K.

2017-09-01

Infrared (IR) sensing technologies and systems operating from the near-infrared (NIR) to long-wave infrared (LWIR) spectra are being developed for a variety of defense and commercial systems applications. Reflection losses affecting a significant portion of the incident signal limits the performance of IR sensing systems. One of the critical technologies that will overcome this limitation and enhance the performance of IR sensing systems is the development of advanced antireflection (AR) coatings. Magnolia is actively involved in the development and advancement of ultrahigh performance AR coatings for a wide variety of defense and commercial applications. Ultrahigh performance nanostructured AR coatings have been demonstrated for UV to LWIR spectral bands using various substrates. The AR coatings enhance the optical transmission through optical components and devices by significantly minimizing reflection losses, a substantial improvement over conventional thin-film AR coating technologies. Nanostructured AR coatings are fabricated using a tunable self-assembly process on substrates that are transparent for a given spectrum of interest ranging from UV to LWIR. The nanostructured multilayer structures have been designed, developed and optimized for various optoelectronic applications. The optical properties of the AR-coated optical components and sensor substrates have been measured and fine-tuned to achieve a predicted high level of performance of the coatings. In this paper, we review our latest work on high quality nanostructure-based AR coatings, including recent efforts towards the development of nanostructured AR coatings on IR-transparent substrates.

Facile and Low-Temperature Fabrication of Thermochromic Cr2O3/VO2 Smart Coatings: Enhanced Solar Modulation Ability, High Luminous Transmittance and UV-Shielding Function.

PubMed

Chang, Tianci; Cao, Xun; Li, Ning; Long, Shiwei; Gao, Xiang; Dedon, Liv R; Sun, Guangyao; Luo, Hongjie; Jin, Ping

2017-08-09

In the pursuit of energy efficient materials, vanadium dioxide (VO 2 ) based smart coatings have gained much attention in recent years. For smart window applications, VO 2 thin films should be fabricated at low temperature to reduce the cost in commercial fabrication and solve compatibility problems. Meanwhile, thermochromic performance with high luminous transmittance and solar modulation ability, as well as effective UV shielding function has become the most important developing strategy for ideal smart windows. In this work, facile Cr 2 O 3 /VO 2 bilayer coatings on quartz glasses were designed and fabricated by magnetron sputtering at low temperatures ranging from 250 to 350 °C as compared with typical high growth temperatures (>450 °C). The bottom Cr 2 O 3 layer not only provides a structural template for the growth of VO 2 (R), but also serves as an antireflection layer for improving the luminous transmittance. It was found that the deposition of Cr 2 O 3 layer resulted in a dramatic enhancement of the solar modulation ability (56.4%) and improvement of luminous transmittance (26.4%) when compared to single-layer VO 2 coating. According to optical measurements, the Cr 2 O 3 /VO 2 bilayer structure exhibits excellent optical performances with an enhanced solar modulation ability (ΔT sol = 12.2%) and a high luminous transmittance (T lum,lt = 46.0%), which makes a good balance between ΔT sol and T lum for smart windows applications. As for UV-shielding properties, more than 95.8% UV radiation (250-400 nm) can be blocked out by the Cr 2 O 3 /VO 2 structure. In addition, the visualized energy-efficient effect was modeled by heating a beaker of water using infrared imaging method with/without a Cr 2 O 3 /VO 2 coating glass.

Assessment of the antireflection property of moth wings by three-dimensional transfer-matrix optical simulations

NASA Astrophysics Data System (ADS)

Deparis, Olivier; Khuzayim, Nadia; Parker, Andrew; Vigneron, Jean Pol

2009-04-01

The wings of the moth Cacostatia ossa (Ctenuchinae) are covered on both sides by non-close-packed nipple arrays which are known to act as broadband antireflection coatings. Experimental evaluation of the antireflection property of these biological structures is problematic because of the lack of a proper reference for reflectance measurements, i.e., a smooth surface made of the same material as the wing. Theoretical evaluation, on the other hand, is much more reliable provided that optical simulations are carried out on a realistic structural model of the wing. Based on detailed morphological characterizations, we established a three-dimensional (3D) model of the wing and used 3D transfer-matrix optical simulations in order to demonstrate the broadband antireflection property of the wings of Cacostatia ossa. Differences between hemispherical and specular reflectance spectra revealed that diffraction effects were not negligible for this structure although they did not jeopardize the antireflection efficiency. The influences of the backside corrugation and of the material’s absorption on the reflectance spectrum were also studied. In addition, simulations based on an effective-medium model of the wing were carried out using a multilayer thin-film code. In comparison with the latter simulations, the 3D transfer-matrix simulations were found to be more accurate for evaluating the antireflection property.

Novel conformal organic antireflective coatings for advanced I-line lithography

NASA Astrophysics Data System (ADS)

Deshpande, Shreeram V.; Nowak, Kelly A.; Fowler, Shelly; Williams, Paul; Arjona, Mikko

2001-08-01

Flash memory chips are playing a critical role in semiconductor devices due to increased popularity of hand held electronic communication devices such as cell phones and PDAs (personal Digital Assistants). Flash memory offers two primary advantages in semiconductor devices. First, it offers flexibility of in-circuit programming capability to reduce the loss from programming errors and to significantly reduce commercialization time to market for new devices. Second, flash memory has a double density memory capability through stacked gate structures which increases the memory capability and thus saves significantly on chip real estate. However, due to stacked gate structures the requirements for manufacturing of flash memory devices are significantly different from traditional memory devices. Stacked gate structures also offer unique challenges to lithographic patterning materials such as Bottom Anti-Reflective Coating (BARC) compositions used to achieve CD control and to minimize standing wave effect in photolithography. To be applicable in flash memory manufacturing a BARC should form a conformal coating on high topography of stacked gate features as well as provide the normal anti-reflection properties for CD control. In this paper we report on a new highly conformal advanced i-line BARC for use in design and manufacture of flash memory devices. Conformal BARCs being significantly thinner in trenches than the planarizing BARCs offer the advantage of reducing BARC overetch and thus minimizing resist thickness loss.

Resonant infrared laser deposition of polymer-nanocomposite materials for optoelectronic applications

NASA Astrophysics Data System (ADS)

Park, Hee K.; Schriver, Kenneth E.; Haglund, Richard F.

2011-11-01

Polymers find a number of potentially useful applications in optoelectronic devices. These include both active layers, such as light-emitting polymers and hole-transport layers, and passive layers, such as polymer barrier coatings and light-management films. This paper reports the experimental results for polymer films deposited by resonant infrared matrix-assisted pulsed laser evaporation (RIR-MAPLE) and resonant infrared pulsed laser deposition (RIR-PLD) for commercial optoelectronic device applications. In particular, light-management films, such as anti-reflection coatings, require refractive-index engineering of a material. However, refractive indices of polymers fall within a relatively narrow range, leading to major efforts to develop both low- and high-refractive-index polymers. Polymer nanocomposites can expand the range of refractive indices by incorporating low- or high-refractive-index nanoscale materials. RIR-MAPLE is an excellent technique for depositing polymer-nanocomposite films in multilayer structures, which are essential to light-management coatings. In this paper, we report our efforts to engineer the refractive index of a barrier polymer by combining RIR-MAPLE of nanomaterials (for example, high refractive-index TiO2 nanoparticles) and RIR-PLD of host polymer. In addition, we report on the properties of organic and polymer films deposited by RIR-MAPLE and/or RIR-PLD, such as Alq3 [tris(8-hydroxyquinoline) aluminum] and PEDOT:PSS [poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate)]. Finally, the challenges and potential for commercializing RIR-MAPLE/PLD, such as industrial scale-up issues, are discussed.

Recent advancements in low cost solar cell processing

NASA Technical Reports Server (NTRS)

Ralph, E. L.

1975-01-01

A proof-of-concept solar cell process has been developed that is adaptable to automation. This involved the development of a new contact system, a new antireflection coating system, a drift field cell design and a new contoured surface treatment. All these processes are performed without the use of vacuum chambers and expensive masking techniques, thus providing the possibility of reduced costs by automation using conventional semiconductor processing machinery. The contacts were printed on the cells by conventional silk screen machinery. The P(+) back field was formed by diffusing in aluminum from a printed aluminum back contact. The antireflection coating was formed by spinning on and baking a TiO2-SiO2 glass film. Air-mass-zero efficiencies of over 10% were achieved using this completely vacuum-free process.

In-situ photoluminescence imaging for passivation-layer etching process control for photovoltaics

NASA Astrophysics Data System (ADS)

Lee, J. Z.; Michaelson, L.; Munoz, K.; Tyson, T.; Gallegos, A.; Sullivan, J. T.; Buonassisi, T.

2014-07-01

Light-induced plating (LIP) of solar-cell metal contacts is a scalable alternative to silver paste. However, LIP requires an additional patterning step to create openings in the silicon nitride (SiNx) antireflection coating (ARC) layer prior to metallization. One approach to pattern the SiNx is masking and wet chemical etching. In-situ real-time photoluminescence imaging (PLI) is demonstrated as a process-monitoring method to determine when SiNx has been fully removed during etching. We demonstrate that the change in PLI signal intensity during etching is caused by a combination of (1) decreasing light absorption from the reduction in SiNx ARC layer thickness and (2) decreasing surface lifetime as the SiNx/Si interface transitions to an etch-solution/Si. Using in-situ PLI to guide the etching process, we demonstrate a full-area plated single-crystalline silicon device. In-situ PLI has the potential to be integrated into a commercial processing line to improve process control and reliability.

Antireflective nanostructures for CPV

NASA Astrophysics Data System (ADS)

Buencuerpo, Jeronimo; Torne, Lorena; Alvaro, Raquel; Llorens, Jose Manuel; Dotor, María Luisa; Ripalda, Jose Maria

2017-09-01

We have optimized a periodic antireflective nanostructure. The optimal design has a theoretical broadband reflectivity of 0.54% on top of GaInP with an AlInP window layer. Preliminary fabrication attempts have been carried out on top of GaAs substrates. Due to the lack of a window layer, and the need to fine tune the fabrication process, the fabricated nanostructures have a reflectivity of 3.1%, but this is already significantly lower than the theoretical broadband reflectance of standard MgF2/ZnS bilayers (4.5%).

Toward maximum transmittance into absorption layers in solar cells: investigation of lossy-film-induced mismatches between reflectance and transmittance extrema.

PubMed

Chang, Yin-Jung; Lai, Chi-Sheng

2013-09-01

The mismatch in film thickness and incident angle between reflectance and transmittance extrema due to the presence of lossy film(s) is investigated toward the maximum transmittance design in the active region of solar cells. Using a planar air/lossy film/silicon double-interface geometry illustrates important and quite opposite mismatch behaviors associated with TE and TM waves. In a typical thin-film CIGS solar cell, mismatches contributed by TM waves in general dominate. The angular mismatch is at least 10° in about 37%-53% of the spectrum, depending on the thickness combination of all lossy interlayers. The largest thickness mismatch of a specific interlayer generally increases with the thickness of the layer itself. Antireflection coating designs for solar cells should therefore be optimized in terms of the maximum transmittance into the active region, even if the corresponding reflectance is not at its minimum.

Analysis of an anti-reflecting nanowire transparent electrode for solar cells

NASA Astrophysics Data System (ADS)

Zhao, Zhexin; Wang, Ken Xingze; Fan, Shanhui

2017-03-01

Transparent electrodes are an important component in many optoelectronic devices, especially solar cells. In this paper, we investigate a nanowire transparent electrode that also functions as an anti-reflection coating for silicon solar cells, taking into account the practical constraints that the electrode is typically encapsulated and needs to be in electric contact with the semiconductor. Numerical simulations show that the electrode can provide near-perfect broadband anti-reflection over much of the frequency range above the silicon band gap for both polarizations while keeping the sheet resistance sufficiently low. To provide insights into the physics mechanism of this broadband anti-reflection, we introduce a generalized Fabry-Perot model, which captures the effects of the higher order diffraction channels as well as the modification of the reflection coefficient of the interface introduced by the nanowires. This model is validated using frequency-domain electromagnetic simulations. Our work here provides design guidelines for nanowire transparent electrode in a device configuration that is relevant for solar cell applications.

Enhancement of the output emission efficiency of thin-film photoluminescence composite structures based on PbSe

DOE Office of Scientific and Technical Information (OSTI.GOV)

Anisimova, N. P.; Tropina, N. E., E-mail: Mazina_ne@mail.ru; Tropin, A. N.

2010-12-15

The opportunity to increase the output emission efficiency of PbSe-based photoluminescence structures by depositing an antireflection layer is analyzed. A model of a three-layer thin film where the central layer is formed of a composite medium is proposed to calculate the reflectance spectra of the system. In von Bruggeman's approximation of the effective medium theory, the effective permittivity of the composite layer is calculated. The model proposed in the study is used to calculate the thickness of the arsenic chalcogenide (AsS{sub 4}) antireflection layer. The optimal AsS{sub 4} layer thickness determined experimentally is close to the results of calculation, andmore » the corresponding gain in the output photoluminescence efficiency is as high as 60%.« less

The effect of multiple antireflective coatings and center thickness on resistance of polycarbonate spectacle lenses to penetration by pointed missiles.

PubMed

Chou, B Ralph; Gupta, Alina; Hovis, Jeffery K

2005-11-01

Previous work has shown that the impact resistance to blunt missiles is affected by coatings applied to either CR-39 or polycarbonate lenses. We investigated the effects of multiple antireflection (minimum angle of resolution [MAR]) coatings on the resistance of polycarbonate lenses to puncture on impact by sharp, high-speed missiles. Four groups of surfaced plano polycarbonate lenses were investigated. Two groups had a scratch-resistant (SR) coating applied to both surfaces. One of these groups had a 2-mm center thickness and the other had a 3-mm center thickness. The other two groups of 2-mm and 3-mm thick lenses had a MAR coating applied over the SR coating. The lenses were impacted by a missile consisting of an industrial sewing machine needle mounted in a cylindrical aluminum carrier. The sharp missiles were able to pierce the lenses at speeds between 29.6 m/s and 46.2 m/s. Impact resistance was lowest for the thinner lenses and lenses with a MAR coating. The effect of the MAR and lens thickness was subadditive. We have confirmed previous observations that polycarbonate lenses are more susceptible to penetration by sharp, high-speed missiles than blunt missiles. We have also found that reducing lens center thickness and applying a MAR coating further reduces the penetration resistance. Therefore, the use of 2-mm center thickness and MAR-coated polycarbonate lenses should be discouraged for industrial eye protectors where sharp missile hazards are possible.

Optical coatings for laser fusion applications

NASA Astrophysics Data System (ADS)

Lowdermilk, W. H.; Milam, D.; Rainer, F.

1980-04-01

Lasers for fusion experiments use thin-film dielectric coatings for reflecting antireflecting and polarizing surface elements. Coatings are most important to the Nd:glass laser application. The most important requirements of these coatings are accuracy of the average value of reflectance and transmission, uniformity of amplitude and phase front of the reflected or transmitted light, and laser damage threshold. Damage resistance strongly affects the laser's design and performance. The success of advanced lasers for future experiments and for reactor applications requires significant developments in damage resistant coatings for ultraviolet laser radiation.

Improvement of silicon solar cell performance through the use of thin film coatings.

PubMed

Reynard, D L; Andrew, A

1966-01-01

Thin film coatings are used universally in solar cell power systems for spacecraft. Antireflective coatings are used to increase the amount of useful energy reaching the active surface of the cell. Multilayer interference filters are employed to reject unwanted portions of the solar spectrum in order to reduce equilibrium temperature and to prevent ultraviolet damage. Glass covers are used in conjunction with these coatings for the purpose of increasing the thermal emittance of the surface. Appreciable performance increases can be obtained through the uses of these filters and coatings.

Organic antireflective coatings for 193-nm lithography

NASA Astrophysics Data System (ADS)

Trefonas, Peter, III; Blacksmith, Robert F.; Szmanda, Charles R.; Kavanagh, Robert J.; Adams, Timothy G.; Taylor, Gary N.; Coley, Suzanne; Pohlers, Gerd

1999-06-01

Organic anti-reflective coatings (ARCs) continue to play an important role in semiconductor manufacturing. These materials provide a convenient means of greatly reducing the resist photospeed swing and reflective notching. In this paper, we describe a novel class of ARC materials optimized for lithographic applications using 193 nm exposure tools. These ARCs are based upon polymers containing hydroxyl-alkyl methacrylate monomers for crosslinkable sites, styrene for a chromophore at 193 nm, and additional alkyl-methacrylate monomers as property modifiers. A glycouril crosslinker and a thermally-activated acidic catalyst provide a route to forming an impervious crosslinked film activate data high bake temperatures. ARC compositions can be adjusted to optimize the film's real and imaginary refractive indices. Selection of optimal target indices for 193 nm lithographic processing through simulations is described. Potential chromophores for 193 nm were explored using ZNDO modeling. We show how these theoretical studies were combined with material selection criteria to yield a versatile organic anti-reflectant film, Shipley 193 G0 ARC. Lithographic process data indicates the materials is capable of supporting high resolution patterning, with the line features displaying a sharp resist/ARC interface with low line edge roughness. The resist Eo swing is successfully reduced from 43 percent to 6 percent.

Antireflection and SiO2 Surface Passivation by Liquid-Phase Chemistry for Efficient Black Silicon Solar Cells: Preprint

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yuan, H. C.; Oh, J.; Zhang, Y.

2012-06-01

We report solar cells with both black Si antireflection and SiO2 surface passivation provided by inexpensive liquid-phase chemistry, rather than by conventional vacuum-based techniques. Preliminary cell efficiency has reached 16.4%. Nanoporous black Si antireflection on crystalline Si by aqueous etching promises low surface reflection for high photon utilization, together with lower manufacturing cost compared to vacuum-based antireflection coating. Ag-nanoparticle-assisted black Si etching and post-etching chemical treatment recently developed at NREL enables excellent control over the pore diameter and pore separation. Performance of black Si solar cells, including open-circuit voltage, short-circuit current density, and blue response, has benefited from these improvements.more » Prior to this study, our black Si solar cells were all passivated by thermal SiO2 produced in tube furnaces. Although this passivation is effective, it is not yet ideal for ultra-low-cost manufacturing. In this study, we report, for the first time, the integration of black Si with a proprietary liquid-phase deposition (LPD) passivation from Natcore Technology. The Natcore LPD forms a layer of <10-nm SiO2 on top of the black Si surface in a relatively mild chemical bath at room temperature. We demonstrate black Si solar cells with LPD SiO2 with a spectrum-weighted average reflection lower than 5%, similar to the more costly thermally grown SiO2 approach. However, LPD SiO2 provides somewhat better surface-passivation quality according to the lifetime analysis by the photo-conductivity decay measurement. Moreover, black Si solar cells with LPD SiO2 passivation exhibit higher spectral response at short wavelength compared to those passivated by thermally grown SiO2. With further optimization, the combination of aqueous black Si etching and LPD could provide a pathway for low-cost, high-efficiency crystalline Si solar cells.« less

Improved performance of Mg-Y alloy thin film switchable mirrors after coating with a superhydrophobic surface

NASA Astrophysics Data System (ADS)

La, Mao; Zhou, Huaijuan; Li, Ning; Xin, Yunchuan; Sha, Ren; Bao, Shanhu; Jin, Ping

2017-05-01

The magnesium based switchable mirrors can reversibly change their optical properties between the transparent and the reflective state as a result of hydrogenation and dehydrogenation. These films can potentially be applied as new energy-saving windows, by controlling the transmittance of solar radiation through the regulation of their reflective state. In this study, magnesium-yttrium (Mg-Y) alloy thin films were prepared using a DC magnetron sputtering method. However, the luminous transmittance in the transparent state and the switching durability of switchable mirrors are too poor to satisfy practical demands. In order to improve the films switching durability, luminous transmittance and the surface functionalization, polytetrafluoroethylene (PTFE) was coated with thermal vacuum deposition for use as the top layer of Mg-Y/Pd switchable mirrors. The PTFE layer had a porous network structure and exhibited a superhydrophobic surface with a water contact angle of approximately 152°. By characterization, PTFE thin films shows the excellent protection role against the oxidization of Mg, the switching durability of the films were improved 3 times, and also shows the antireflection role the luminous transmission of films was enhanced by 7% through the top covered with PTFE.

Metasurface-based anti-reflection coatings at optical frequencies

NASA Astrophysics Data System (ADS)

Monti, Alessio; Alù, Andrea; Toscano, Alessandro; Bilotti, Filiberto

2018-05-01

In this manuscript, we propose a metasurface approach for the reduction of electromagnetic reflection from an arbitrary air‑dielectric interface. The proposed technique exploits the exotic optical response of plasmonic nanoparticles to achieve complete cancellation of the field reflected by a dielectric substrate by means of destructive interference. Differently from other, earlier anti-reflection approaches based on nanoparticles, our design scheme is supported by a simple transmission-line formulation that allows a closed-form characterization of the anti-reflection performance of a nanoparticle array. Furthermore, since the working principle of the proposed devices relies on an average effect that does not critically depend on the array geometry, our approach enables low-cost production and easy scalability to large sizes. Our theoretical considerations are supported by full-wave simulations confirming the effectiveness of this design principle.

Applications in Energy, Optics and Electronics.

ERIC Educational Resources Information Center

Rosenberg, Robert; And Others

1980-01-01

Discusses the applications of thin films in energy, optics and electronics. The use of thin-film technologies for heat mirrors, anti-reflection coatings, interference filters, solar cells, and metal contacts is included. (HM)

The use of FEP Teflon in solar cell cover technology

NASA Technical Reports Server (NTRS)

Broder, J. D.; Mazaris, G. A.

1973-01-01

FEP plastic film was used as a cover and as an adhesive to bond cover glasses to silicon solar cells. Various anti-reflective coatings were applied to cells and subsequently covered with FEP. Short circuit currents were measured before and after application of the coating and of the FEP. FEP was bonded to seven of the nine differently coated cells, with no change in the total short circuit current in four cases.

The use of FEP Teflon in solar cell cover technology

NASA Technical Reports Server (NTRS)

Broder, J. D.; Mazaris, G. A.

1974-01-01

FEP plastic film was used as a cover and as an adhesive to bond cover glasses to silicon solar cells. Various anti-reflective coatings were applied to cells and subsequently covered with FEP. Short-circuit currents were measured before and after application of the coating and of the FEP. FEP bonded to seven of the nine differently coated cells, with no change in the total short circuit current in four cases.

Ultrawide Spectral Response of CIGS Solar Cells Integrated with Luminescent Down-Shifting Quantum Dots.

PubMed

Jeong, Ho-Jung; Kim, Ye-Chan; Lee, Soo Kyung; Jeong, Yonkil; Song, Jin-Won; Yun, Ju-Hyung; Jang, Jae-Hyung

2017-08-02

Conventional Cu(In 1-x ,Ga x )Se 2 (CIGS) solar cells exhibit poor spectral response due to parasitic light absorption in the window and buffer layers at the short wavelength range between 300 and 520 nm. In this study, the CdSe/CdZnS core/shell quantum dots (QDs) acting as a luminescent down-shifting (LDS) layer were inserted between the MgF 2 antireflection coating and the window layer of the CIGS solar cell to improve light harvesting in the short wavelength range. The LDS layer absorbs photons in the short wavelength range and re-emits photons in the 609 nm range, which are transmitted through the window and buffer layer and absorbed in the CIGS layer. The average external quantum efficiency in the parasitic light absorption region (300-520 nm) was enhanced by 51%. The resulting short circuit current density of 34.04 mA/cm 2 and power conversion efficiency of 14.29% of the CIGS solar cell with the CdSe/CdZnS QDs were improved by 4.35 and 3.85%, respectively, compared with those of the conventional solar cells without QDs.

Recent advancements in anti-reflective surface structures (ARSS) for near- to mid-infrared optics

NASA Astrophysics Data System (ADS)

Florea, Catalin M.; Busse, Lynda E.; Bayya, Shyam S.; Shaw, Brandon; Aggarwal, Ish D.; Sanghera, Jas S.

2013-06-01

Fused silica, YAG crystals, and spinel ceramics substrates have been successfully patterned through reactive ion etching (RIE). Reflection losses as low as 0.1% have been demonstrated for fused silica at 1.06 microns. Laser damage thresholds have been measured for substrates with ARSS and compared with uncoated and/or thin-film anti-reflection (AR) coated substrates. Thresholds as high as 100 J/cm2 have been demonstrated in fused silica with ARSS at 1.06 microns, with ARSS substrates showing improved thresholds when compared with uncoated substrates.

LASER APPLICATIONS AND OTHER TOPICS IN QUANTUM ELECTRONICS: Nanosize relief: from phase masks to antireflection coatings on quartz and silicon

NASA Astrophysics Data System (ADS)

Verevkin, Yu K.; Klimov, A. Yu; Gribkov, B. A.; Petryakov, V. N.; Koposova, E. V.; Olaizola, Santiago M.

2008-11-01

By using the interference of pulsed radiation and a complete lithographic cycle, phase masks on quartz and antireflection structures on quartz and silicon are produced. The transmission of radiation through a corrugated vacuum—solid interface is calculated by solving rigorously an integral equation with the help of a computer program for parameters close to experimental parameters. The results of measurements are in good agreement with calculations. The methods developed in the paper can be used for manufacturing optical and semiconductor devices.

Nanonewton optical force trap employing anti-reflection coated, high-refractive-index titania microspheres

NASA Astrophysics Data System (ADS)

Jannasch, Anita; Demirörs, Ahmet F.; van Oostrum, Peter D. J.; van Blaaderen, Alfons; Schäffer, Erik

2012-07-01

Optical tweezers are exquisite position and force transducers and are widely used for high-resolution measurements in fields as varied as physics, biology and materials science. Typically, small dielectric particles are trapped in a tightly focused laser and are often used as handles for sensitive force measurements. Improvement to the technique has largely focused on improving the instrument and shaping the light beam, and there has been little work exploring the benefit of customizing the trapped object. Here, we describe how anti-reflection coated, high-refractive-index core-shell particles composed of titania enable single-beam optical trapping with an optical force greater than a nanonewton. The increased force range broadens the scope of feasible optical trapping experiments and will pave the way towards more efficient light-powered miniature machines, tools and applications.

High operating temperature nBn detector with monolithically integrated microlens

NASA Astrophysics Data System (ADS)

Soibel, Alexander; Keo, Sam A.; Fisher, Anita; Hill, Cory J.; Luong, Edward; Ting, David Z.; Gunapala, Sarath D.; Lubyshev, Dmitri; Qiu, Yueming; Fastenau, Joel M.; Liu, Amy W. K.

2018-01-01

We demonstrate an InAsSb nBn detector monolithically integrated with a microlens fabricated on the back side of the detector. The increase in the optical collection area of the detector resulted in a five-fold enhancement of the responsivity to Rp = 5.5 A/W. The responsivity increases further to Rp = 8.5 A/W with an antireflection coating. These 4.5 μm cut-off wavelength antireflection coated detectors with microlenses exhibited a detectivity of D* (λ) = 2.7 × 1010 cmHz0.5/W at T = 250 K, which can be reached easily with a single-stage thermoelectric cooler or with a passive radiator in the space environment. This represents a 25 K increase in the operating temperature of these devices compared to the uncoated detectors without an integrated microlens.

Polarization sensitivity of ordered and random antireflective surface structures in silica and spinel

NASA Astrophysics Data System (ADS)

Frantz, J. A.; Selby, J.; Busse, L. E.; Shaw, L. B.; Aggarwal, I. D.; Sanghera, J. S.

2018-02-01

Both ordered and random anti-reflective surface structures (ARSS) have been shown to increase the transmission of an optical surface to >99.9%. These structures are of great interest as an alternative to traditional thin film anti-reflection (AR) coatings for a variety of reasons. Unlike traditional AR coatings, they are patterned directly into the surface of an optic rather than deposited on its surface and are thus not prone to the delamination under thermal cycling that can occur with thin film coatings. Their laser-induced damage thresholds can also be considerably higher. In addition, they provide AR performance over a larger spectral and angular range. It has been previously demonstrated that random ARSSs in silica are remarkably insensitive to incident polarization, with nearly zero variation in transmittance with respect to polarization of the incident beam at fixed wavelength for angles of incidence up to at least 30°. In this work, we evaluate polarization sensitivity of ARSS as a function of wavelength for both random and ordered ARSS. We demonstrate that ordered ARSS is significantly more sensitive to polarization than random ARSS and explain the reason for this difference. In the case of ordered ARSS, we observe significant differences as a function of wavelength, with the transmittance of s- and p-polarized light diverging near the diffraction edge. We present results for both silica and spinel samples and discuss differences observed for these two sets of samples.

Solder glass sealing technology for use in packaging of fiber optic sensors

NASA Astrophysics Data System (ADS)

Kreutzmann, Gerd

1990-08-01

The solder glass sealing technology is an alternative to the direct sealing method of the socalled hboptocansu. Using solder glass for the junction of glass and the metal can the temperature at about 500 °C does not destroy the optical quality of the precision glass components. The glass can also be coated with an antireflective layer and even the sealing of filterglass is possible. In cases where coupling losses can't be tolerated, the fiber has to be fed directly through the wall into the housing. Fiber feedthroughs, using solder glass for the sealing of the fiber into a metal tube, are commonly metal soldered or welded into the wall and the fiber surface is directly leading to the semiconductor.

Niobium oxide synthesized via etching agent - assisted hydrothermal process: A films with low reflectance properties

NASA Astrophysics Data System (ADS)

Rani, Rozina Abdul; Zoolfakar, Ahmad Sabirin; Alrokayan, Salman; Khan, Haseeb; Rusop, M.

2018-05-01

In this paper, synthesis of the hydrothermal based etching process of niobium oxide (Nb2O5) films and their reflectance properties are presented. The concentration of etching agent, which is ammonium fluoride (NH4F) in the hydrothermal solution as well as the grain size and the annealing condition have significantly affected the reflectance properties of Nb2O5 films. Films that synthesized in 1.65M of NH4F solution showed the lowest percentage of reflectance value of 3.22% at 222 nm. The obtained reflectance results have shown that this kind of Nb2O5 films is very suitable for anti-reflective coating layer and UV sensor application.

Inkjet printing of TiO2/AlOOH heterostructures for the formation of interference color images with high optical visibility

PubMed Central

Yakovlev, Aleksandr V.; Milichko, Valentin A.; Pidko, Evgeny A.; Vinogradov, Vladimir V.; Vinogradov, Alexandr V.

2016-01-01

This paper describes a practical approach for the fabrication of highly visible interference color images using sol-gel ink technique and a common desktop inkjet printer. We show the potential of titania-boehmite inks for the production of optical heterostructures on various surfaces, which after drying on air produce optical solid layers with low and high refractive index. The optical properties of the surface heterostructures were adjusted following the principles of antireflection coating resulting in the enhancement of the interference color optical visibility of the prints by as much as 32%. Finally, the presented technique was optimized following the insights into the mechanisms of the drop-surface interactions and the drop-on-surface coalescence to make it suitable for the production of even thickness coatings suitable for printing at a large scale. We propose that the technology described herein is a promising new green and sustainable approach for color printing. PMID:27848979

Optimization of imprintable nanostructured a-Si solar cells: FDTD study.

PubMed

Fisker, Christian; Pedersen, Thomas Garm

2013-03-11

We present a finite-difference time-domain (FDTD) study of an amorphous silicon (a-Si) thin film solar cell, with nano scale patterns on the substrate surface. The patterns, based on the geometry of anisotropically etched silicon gratings, are optimized with respect to the period and anti-reflection (AR) coating thickness for maximal absorption in the range of the solar spectrum. The structure is shown to increase the cell efficiency by 10.2% compared to a similar flat solar cell with an optimized AR coating thickness. An increased back reflection can be obtained with a 50 nm zinc oxide layer on the back reflector, which gives an additional efficiency increase, leading to a total of 14.9%. In addition, the patterned cells are shown to be up to 3.8% more efficient than an optimized textured reference cell based on the Asahi U-type glass surface. The effects of variations of the optimized solar cell structure due to the manufacturing process are investigated, and shown to be negligible for variations below ±10%.

Laser ablation mechanism of transparent layers on semiconductors with ultrashort laser pulses

NASA Astrophysics Data System (ADS)

Rublack, Tino; Hartnauer, Stefan; Mergner, Michael; Muchow, Markus; Seifert, Gerhard

2011-12-01

Transparent dielectric layers on semiconductors are used as anti-reflection coatings both for photovoltaic applications and for mid-infrared optical elements. We have shown recently that selective ablation of such layers is possible using ultrashort laser pulses at wavelengths being absorbed by the semiconductor. To get a deeper understanding of the ablation mechanism, we have done ablation experiments for different transparent materials, in particular SiO2 and SixNy on silicon, using a broad range of wavelengths ranging from UV to IR, and pulse durations between 50 and 2000 fs. The characterization of the ablated regions was done by light microscopy and atomic force microscopy (AFM). Utilizing laser wavelengths above the silicon band gap, selective ablation of the dielectric layer without noticeable damage of the opened silicon surface is possible. In contrast, ultrashort pulses (1-2 ps) at mid-infrared wavelengths already cause damage in the silicon at lower intensities than in the dielectric layer, even when a vibrational resonance (e.g. at λ = 9.26 μm for SiO2) is addressed. The physical processes behind this, on the first glance counterintuitive, observation will be discussed.

Highly transparent triboelectric nanogenerator for harvesting water-related energy reinforced by antireflection coating

NASA Astrophysics Data System (ADS)

Liang, Qijie; Yan, Xiaoqin; Gu, Yousong; Zhang, Kui; Liang, Mengyuan; Lu, Shengnan; Zheng, Xin; Zhang, Yue

2015-03-01

Water-related energy is an inexhaustible and renewable energy resource in our environment, which has huge amount of energy and is not largely dictated by daytime and sunlight. The transparent characteristic plays a key role in practical applications for some devices designed for harvesting water-related energy. In this paper, a highly transparent triboelectric nanogenerator (T-TENG) was designed to harvest the electrostatic energy from flowing water. The instantaneous output power density of the T-TENG is 11.56 mW/m2. Moreover, with the PTFE film acting as an antireflection coating, the maximum transmittance of the fabricated T-TENG is 87.4%, which is larger than that of individual glass substrate. The T-TENG can be integrated with silicon-based solar cell, building glass and car glass, which demonstrates its potential applications for harvesting waste water energy in our living environment and on smart home system and smart car system.

Highly transparent triboelectric nanogenerator for harvesting water-related energy reinforced by antireflection coating.

PubMed

Liang, Qijie; Yan, Xiaoqin; Gu, Yousong; Zhang, Kui; Liang, Mengyuan; Lu, Shengnan; Zheng, Xin; Zhang, Yue

2015-03-13

Water-related energy is an inexhaustible and renewable energy resource in our environment, which has huge amount of energy and is not largely dictated by daytime and sunlight. The transparent characteristic plays a key role in practical applications for some devices designed for harvesting water-related energy. In this paper, a highly transparent triboelectric nanogenerator (T-TENG) was designed to harvest the electrostatic energy from flowing water. The instantaneous output power density of the T-TENG is 11.56 mW/m(2). Moreover, with the PTFE film acting as an antireflection coating, the maximum transmittance of the fabricated T-TENG is 87.4%, which is larger than that of individual glass substrate. The T-TENG can be integrated with silicon-based solar cell, building glass and car glass, which demonstrates its potential applications for harvesting waste water energy in our living environment and on smart home system and smart car system.

Adhesion of Antireflective Coatings in Multijunction Photovoltaics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Brock, Ryan; Miller, David C.; Dauskardt, Reinhold H.

2016-11-21

The development of a new composite dual cantilever beam (cDCB) thin-film adhesion testing method is reported, which allows the measurement of adhesion on the fragile thin substrates used in multijunction photovoltaics. We address the adhesion of several antireflective coating systems on multijunction cells. By varying interface chemistry and morphology, we demonstrate the ensuing effects on adhesion and help to develop an understanding of how high adhesion can be achieved, as adhesion values ranging from 0.5 J/m2 to 10 J/m2 were measured. Damp Heat (85 degrees C/85% RH) was used to invoke degradation of interfacial adhesion. We show that even withmore » germanium substrates that fracture easily, quantitative measurements of adhesion can still be made at high test yield. The cDCB test is discussed as an important new methodology, which can be broadly applied to any system that makes use of thin, brittle, or otherwise fragile substrates.« less

Adhesion of Antireflective Coatings in Multijunction Photovoltaics: Preprint

DOE Office of Scientific and Technical Information (OSTI.GOV)

Brock, Ryan; Dauskardt, Reinhold H.; Miller, David C.

2016-06-16

The development of a new composite dual cantilever beam (cDCB) thin-film adhesion testing method is reported, which allows the measurement of adhesion on the fragile thin substrates used in multijunction photovoltaics. We address the adhesion of several antireflective coating systems on multijunction cells. By varying interface chemistry and morphology, we demonstrate the ensuing effects on adhesion and help to develop an understanding of how high adhesion can be achieved, as adhesion values ranging from 0.5 J/m2 to 10 J/m2 were measured. Damp Heat (85 degrees C/85% RH) was used to invoke degradation of interfacial adhesion. We show that even withmore » germanium substrates that fracture easily, quantitative measurements of adhesion can still be made at high test yield. The cDCB test is discussed as an important new methodology, which can be broadly applied to any system that makes use of thin, brittle, or otherwise fragile substrates.« less

Broadband omnidirectional antireflection coating based on subwavelength surface Mie resonators

PubMed Central

Spinelli, P.; Verschuuren, M.A.; Polman, A.

2012-01-01

Reflection is a natural phenomenon that occurs when light passes the interface between materials with different refractive index. In many applications, such as solar cells or photodetectors, reflection is an unwanted loss process. Many ways to reduce reflection from a substrate have been investigated so far, including dielectric interference coatings, surface texturing, adiabatic index matching and scattering from plasmonic nanoparticles. Here we present an entirely new concept that suppresses the reflection of light from a silicon surface over a broad spectral range. A two-dimensional periodic array of subwavelength silicon nanocylinders designed to possess strongly substrate-coupled Mie resonances yields almost zero total reflectance over the entire spectral range from the ultraviolet to the near-infrared. This new antireflection concept relies on the strong forward scattering that occurs when a scattering structure is placed in close proximity to a high-index substrate with a high optical density of states. PMID:22353722

Stability of anti-reflection coatings via the self-assembly encapsulation of silica nanoparticles by diazo-resins

NASA Astrophysics Data System (ADS)

Metzman, Jonathan S.; Ridley, Jason I.; Khalifa, Moataz B.; Heflin, James R.

2015-12-01

A modified silica nanoparticle (MSNP) solution was formed by the encapsulation of negatively charged silica nanoparticles by the UV-crosslinkable polycation oligomer diazo-resin (DAR). Appropriate DAR encapsulation concentrations were determined by use of zeta-potential and dynamic light scattering measurements. The MSNPs were used in conjunction with poly(styrene sulfonate) (PSS) to grow homogenous ionic self-assembled multilayer anti-reflection coatings. Stability was induced within the films by the exposure of UV-irradiation that allowed for crosslinking of the DAR and PSS. The films were characterized by UV/vis/IR spectroscopy and field emission scanning electron microscopy. The transmission and reflection levels were >98.5% and <0.05%, respectively. The refractive indices resided in the 1.25-1.26 range. The solvent stability was tested by sonication of the films in a ternary solvent (H2O/DMF/ZnCl2 3:5:2 w/w/w).

Mechanical comparison of a polymer nanocomposite to a ceramic thin-film anti-reflective filter.

PubMed

Druffel, Thad; Geng, Kebin; Grulke, Eric

2006-07-28

Thin-film filters on optical components have been in use for decades and, for those industries utilizing a polymer substrate, the mismatch in mechanical behaviour has caused problems. Surface damage including scratches and cracks induces haze on the optical filter, reducing the transmission of the optical article. An in-mold anti-reflective (AR) filter incorporating 1/4-wavelength thin films based on a polymer nanocomposite is outlined here and compared with a traditional vacuum deposition AR coating. Nanoindentation and nanoscratch techniques are used to evaluate the mechanical properties of the thin films. Scanning electron microscopy (SEM) images of the resulting indentations and scratches are then compared to the force deflection curves to further explain the phenomena. The traditional coatings fractured by brittle mechanisms during testing, increasing the area of failure, whereas the polymer nanocomposite gave ductile failure with less surface damage.

Broad Band Antireflection Coating on Zinc Sulphide Window for Shortwave infrared cum Night Vision System

NASA Astrophysics Data System (ADS)

Upadhyaya, A. S.; Bandyopadhyay, P. K.

2012-11-01

In state of art technology, integrated devices are widely used or their potential advantages. Common system reduces weight as well as total space covered by its various parts. In the state of art surveillance system integrated SWIR and night vision system used for more accurate identification of object. In this system a common optical window is used, which passes the radiation of both the regions, further both the spectral regions are separated in two channels. ZnS is a good choice for a common window, as it transmit both the region of interest, night vision (650 - 850 nm) as well as SWIR (0.9 - 1.7 μm). In this work a broad band anti reflection coating is developed on ZnS window to enhance the transmission. This seven layer coating is designed using flip flop design method. After getting the final design, some minor refinement is done, using simplex method. SiO2 and TiO2 coating material combination is used for this work. The coating is fabricated by physical vapour deposition process and the materials were evaporated by electron beam gun. Average transmission of both side coated substrate from 660 to 1700 nm is 95%. This coating also acts as contrast enhancement filter for night vision devices, as it reflect the region of 590 - 660 nm. Several trials have been conducted to check the coating repeatability, and it is observed that transmission variation in different trials is not very much and it is under the tolerance limit. The coating also passes environmental test for stability.

Secondary Electron Emission From Solar Cell Coverslides And Its Effect On Absolute Vehicle Charging

NASA Astrophysics Data System (ADS)

Ferguson, Dale C.

2011-10-01

It has often been stated that earthed conductive solar cell coverslides are the best way to prevent electrostatic discharges on space solar arrays in GEO. While it is true that such coverslides will prevent differential charging on the solar arrays, it will be shown through NASCAP- 2k simulations that the secondary electron emission of such coverslides is very important for absolute vehicle charging. In particular, carbon nanotube coatings, due to the extremely low secondary electron emission from carbon, may exacerbate absolute vehicle charging. However, if they are earthed, because of their conductivity they may minimize differential charging and the possibility of arcing elsewhere on the spacecraft. Such results may also be true for insulative coverslides if spacecraft thermal blankets are made of materials with high secondary electron emission. Finally, photoemission from coverslides is investigated, with regard to anti-reflection coatings. Surfaces which reflect UV can have low photoemission, while those that absorb may have higher photoemission rates. Thus, anti-reflection coatings may lead to higher absolute spacecraft charging rates. NASCAP-2k simulations will be used to investigate these dependences for realistic spacecraft.

Optical properties of chitin: surface-enhanced Raman scattering substrates based on antireflection structures on cicada wings

NASA Astrophysics Data System (ADS)

Stoddart, P. R.; Cadusch, P. J.; Boyce, T. M.; Erasmus, R. M.; Comins, J. D.

2006-02-01

The transparent wings of some cicada species present ordered arrays of papillary structures with a spacing of approximately 200 nm. These structures serve an antireflection function, with optical transmission peaking at a value of approximately 98% and rising above 90% over a broad band from 450 to 2500 nm. The dimensions of the papillae are comparable to the roughness scale of surface-enhanced Raman scattering (SERS) substrates. SERS measurements performed on silver- and gold-coated wings display enhancement factors of approximately 106 with no apparent background contribution from the wing.

A versatile route to polymer-reinforced, broadband antireflective and superhydrophobic thin films without high-temperature treatment.

PubMed

Ren, Tingting; Geng, Zhi; He, Junhui; Zhang, Xiaojie; He, Jin

2017-01-15

Broadband high transmittance, good mechanical robustness as well as simple and low temperature fabrication are three important aspects that dictate the practical applications of superhydrophobic thin films, especially on organic substrates. However, it has proved difficult to meet these challenges. In the present work, superhydrophobic thin films were prepared by first dip-coating solid silica nanoparticles, then spray-coating hollow silica nanoparticles, followed by spray-coating mesoporous silica nanosheets & poly(vinyl alcohol) (PVA), and eventually chemical vapor deposition of 1H,1H,2H,2H-perflurooctyltriethoxysilane (POTS) at 90°C. The optimized thin film has a maximum transmittance of 96.0% in the wavelength range of 300-2500nm and a WCA of 164° and a RA of 1°. The thin film also shows good mechanical robustness toward water droplet impact test, sand impact abrasion test and tape adhesion tests, which results from PVA as a binder, the formation of covalent bond between the hydroxyl group of PVA and the ethoxy group of POTS and the chemical inertness of CC, CF bonds of POTS molecules. To our best knowledge, it is the first example where antireflective and superhydrophobic thin films of excellent mechanical robustness were realized at low temperature on organic substrates (PMMA, PC). The current work would provide a promising route to meet the challenges in practical applications simultaneously posed by the requirements of broadband antireflection, good mechanical robustness as well as simple and low temperature fabrication of superhydrophobic thin films. Copyright © 2016 Elsevier Inc. All rights reserved.

Design and optimization of ARC less InGaP/GaAs single-/multi-junction solar cells with tunnel junction and back surface field layers

NASA Astrophysics Data System (ADS)

Chee, Kuan W. A.; Hu, Yuning

2018-07-01

There has always been an inexorable interest in the solar industry in boosting the photovoltaic conversion efficiency. This paper presents a theoretical and numerical simulation study of the effects of key design parameters on the photoelectric performance of single junction (InGaP- or GaAs-based) and dual junction (InGaP/GaAs) inorganic solar cells. The influence of base layer thickness, base doping concentration, junction temperature, back surface field layer composition and thickness, and tunnel junction material, were correlated with open circuit voltage, short-circuit current, fill factor and power conversion efficiency performance. The InGaP/GaAs dual junction solar cell was optimized with the tunnel junction and back surface field designs, yielding a short-circuit current density of 20.71 mAcm-2 , open-circuit voltage of 2.44 V and fill factor of 88.6%, and guaranteeing an optimal power conversion efficiency of at least 32.4% under 1 sun AM0 illumination even without an anti-reflective coating.

High-efficiency thin-film GaAs solar cells, phase2

NASA Technical Reports Server (NTRS)

Yeh, Y. C. M.

1981-01-01

Thin GaAs epi-layers with good crystallographic quality were grown using a (100) Si-substrate on which a thin Ge epi-interlayer was grown by CVD from germane. Both antireflection-coated metal oxide semiconductor (AMOS) and n(+)/p homojunction structures were studied. The AMOS cells were fabricated on undoped-GaAs epi-layers deposited on bulk poly-Ge substrates using organo-metallic CVD film-growth, with the best achieved AM1 conversion efficiency being 9.1%. Both p-type and n(+)-type GaAs growth were optimized using 50 ppm dimethyl zinc and 1% hydrogen sulfide, respectively. A direct GaAs deposition method in fabricating ultra-thin top layer, epitaxial n(+)/p shallow homojunction solar cells on (100) GaAs substrates (without anodic thinning) was developed to produce large area (1 sq/cm) cells, with 19.4% AM1 conversion efficiency achieved. Additionally, an AM1 conversion efficiency of 18.4% (17.5% with 5% grid coverage) was achieved for a single crystal GaAs n(+)/p cell grown by OM-CVD on a Ge wafer.

Low-cost, high-efficiency organic/inorganic hetero-junction hybrid solar cells for next generation photovoltaic device

NASA Astrophysics Data System (ADS)

Pudasaini, P. R.; Ayon, A. A.

2013-12-01

Organic/inorganic hybrid structures are considered innovative alternatives for the next generation of low-cost photovoltaic devices because they combine advantages of the purely organic and inorganic versions. Here, we report an efficient hybrid solar cell based on sub-wavelength silicon nanotexturization in combination with the spin-coating of poly (3,4-ethylene-dioxythiophene):polystyrenesulfonate (PEDOT:PSS). The described devices were analyzed by collecting current-voltage and capacitance-voltage measurements in order to explore the organic/inorganic heterojunction properties. ALD deposited ultrathin aluminium oxide was used as a junction passivation layer between the nanotextured silicon surface and the organic polymer. The measured interface defect density of the device was observed to decrease with the inclusion of an ultrathin Al2O3 passivation layer leading to an improved electrical performance. This effect is thought to be ascribed to the suppression of charge recombination at the organic/inorganic interface. A maximum power conversion efficiency in excess of 10% has been achieved for the optimized geometry of the device, in spite of lacking an antireflection layer or back surface field enhancement schemes.

Quantitative image analysis for evaluating the abrasion resistance of nanoporous silica films on glass

PubMed Central

Nielsen, Karsten H.; Karlsson, Stefan; Limbach, Rene; Wondraczek, Lothar

2015-01-01

The abrasion resistance of coated glass surfaces is an important parameter for judging lifetime performance, but practical testing procedures remain overly simplistic and do often not allow for direct conclusions on real-world degradation. Here, we combine quantitative two-dimensional image analysis and mechanical abrasion into a facile tool for probing the abrasion resistance of anti-reflective (AR) coatings. We determine variations in the average coated area, during and after controlled abrasion. Through comparison with other experimental techniques, we show that this method provides a practical, rapid and versatile tool for the evaluation of the abrasion resistance of sol-gel-derived thin films on glass. The method yields informative data, which correlates with measurements of diffuse reflectance and is further supported by qualitative investigations through scanning electron microscopy. In particular, the method directly addresses degradation of coating performance, i.e., the gradual areal loss of antireflective functionality. As an exemplary subject, we studied the abrasion resistance of state-of-the-art nanoporous SiO2 thin films which were derived from 5–6 wt% aqueous solutions of potassium silicates, or from colloidal suspensions of SiO2 nanoparticles. It is shown how abrasion resistance is governed by coating density and film adhesion, defining the trade-off between optimal AR performance and acceptable mechanical performance. PMID:26656260

An experimental study of antireflective coatings in Ge light detectors for scintillating bolometers

NASA Astrophysics Data System (ADS)

Mancuso, M.; Beeman, J. W.; Giuliani, A.; Dumoulin, L.; Olivieri, E.; Pessina, G.; Plantevin, O.; Rusconi, C.; Tenconi, M.

2014-01-01

Luminescent bolometers are double-readout devices able to measure simultaneously the phonon and the light yields after a particle interaction in the detector. This operation allows in some cases to tag the type of the interacting quantum, crucial issue for background control in rare event experiments such as the search for neutrinoless double beta decay and for interactions of particle dark matter candidates. The light detectors used in the LUCIFER and LUMINEU searches (projects aiming at the study of the double beta interesting candidates 82Se and 100Mo using ZnSe and ZnMoO4 scintillating bolometers) consist of hyper-pure Ge thin slabs equipped with NTD thermistors. A substantial sensitivity improvement of the Ge light detectors can be obtained applying a proper anti-reflective coatings on the Ge side exposed to the luminescent bolometer. The present paper deals with the investigation of this aspect, proving and quantifying the positive effect of a SiO2 and a SiO coating and setting the experimental bases for future tests of other coating materials. The results confirm that an appropriate coating procedure helps in improving the sensitivity of bolometric light detectors by an important factor (in the range 20% - 35%) and needs to be included in the recipe for the development of an optimized radio-pure scintillating bolometer.

High-efficiency screen-printed belt co-fired solar cells on cast multicrystalline silicon

NASA Astrophysics Data System (ADS)

Upadhyaya, Ajay; Sheoran, Manav; Rohatgi, Ajeet

2005-01-01

High-efficiency 4cm2 untextured screen-printed solar cells were achieved on cast multicrystalline silicon. These cells were fabricated using a simple manufacturable process involving POCl3 diffusion for emitter, PECVD SiNx:H deposition for a single-layer antireflection coating and rapid co-firing of Ag grid, Al backcontact, and Al-BSF in a belt furnace. An optimized process sequence contributed to effective impurity gettering and defect passivation, resulting in high average bulk lifetimes in the range of 100-250 μs after the cell processing. The contact firing contributed to good ohmic contacts with low series resistance of <1Ωcm2, low backsurface recombination velocity of <500cm/s, and high fill factors of ˜0.78. These parameters resulted in 16.9% and 16.8% efficient untextured screen-printed cells with a single layer AR coating on heat exchanger method (HEM) and Baysix mc-Si. The identical process applied to the untextured float zone wafers gave an efficiency of 17.2%. The same optimized co-firing cycle, when applied to HEM mc-Si wafers with starting lifetimes varying over a wide range of 4-70 μs, resulted in cell efficiencies in the range of 16.5%-17%.

Technology of GaAs metal-oxide-semiconductor solar cells

NASA Technical Reports Server (NTRS)

Stirn, R. J.; Yeh, Y. C. M.

1977-01-01

The growth of an oxide interfacial layer was recently found to increase the open-circuit voltage (OCV) and efficiency by up to 60 per cent in GaAs metal-semiconductor solar cells. Details of oxidation techniques to provide the necessary oxide thickness and chemical structure and using ozone, water-vapor-saturated oxygen, or oxygen gas discharges are described, as well as apparent crystallographic orientation effects. Preliminary results of the oxide chemistry obtained from X-ray, photoelectron spectroscopy are given. Ratios of arsenic oxide to gallium oxide of unity or less seem to be preferable. Samples with the highest OVC predominantly have As(+3) in the arsenic oxide rather than As(+5). A major difficulty at this time is a reduction in OCV by 100-200 mV when the antireflection coating is vacuum deposited.

Effect of growth rate on crystallization of HfO{sub 2} thin films deposited by RF magnetron sputtering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Dhanunjaya, M.; Manikanthababu, N.; Pathak, A. P.

2016-05-23

Hafnium oxide (HfO{sub 2}) is the potentially useful dielectric material in both; electronics to replace the conventional SiO{sub 2} as gate dielectric and in Optics as anti-reflection coating material. In this present work we have synthesized polycrystalline HfO{sub 2} thin films by RF magnetron sputtering deposition technique with varying target to substrate distance. The deposited films were characterized by X-ray Diffraction, Rutherford Backscattering Spectrometry (RBS) and transmission and Reflection (T&R) measurements to study the growth behavior, microstructure and optical properties. XRD measurement shows that the samples having mixed phase of monoclinic, cubic and tetragonal crystal structure. RBS measurements suggest themore » formation of Inter Layer (IL) in between Substrate and film.« less

Enhanced absorption of TM waves in conductive nanoparticles structure

NASA Astrophysics Data System (ADS)

Mousa, H. M.; Shabat, M. M.; Ouda, A. K.; Schaadt, D. M.

2018-05-01

This paper tackles anti-reflection coating structure for silicon solar cell where conductive nanoparticle (CNP) film is sandwiched between a semi-infinite glass cover and a semi-infinite silicon substrate. The transmission and reflection coefficients are derived by the transfer matrix method and simulated for values of unit cell sizes, gab widths in visible and near-infrared radiation. We also illustrated the dependence of the absorption, transmission and reflection coefficients on several angles of incidence of the transverse magnetic polarized (TM) waves. We found out that reflection decreases by the increase of incident angle to 50∘. If nanoparticles are suitably located and sized at gab width of 3.5 nm, unit cell of 250 nm and CNP layer thickness of 150 nm, the absorptivity of the structure achieves 100%.

Optoelectronic Characterization of Infrared Photodetector Fabricated on Ge-on-Si Substrate.

PubMed

Khurelbaatar, Zagarzusem; Kil, Yeon-Ho; Kim, Taek Sung; Shim, Kyu-Hwan; Hong, Hyobong; Choi, Chel-Jong

2015-10-01

We report on the optoelectronic characterization of Ge p-i-n infrared photodetector fabricated on Ge-on-Si substrate using rapid thermal chemical vapor deposition (RTCVD). The phosphorous doping concentration and the root mean square (RMS) surface roughness of epitaxial layer was estimated to be 2 x 10(18) cm(-3) and 1.2 nm, respectively. The photodetector were characterized with respect to their dark, photocurrent and responsivities in the wavelength range of 1530-1630 nm. At 1550 nm wavelength, responsivity of 0.32 A/W was measured for a reverse bias of 1 V, corresponding to 25% external quantum efficiency, without an optimal antireflection coating. Responsivity drastically reduced from 1560 nm wavelength which could be attributed to decreased absorption of Ge at room temperature.

Silicon PV cell production on the Moon as the basis for a new architecture for space exploration

NASA Astrophysics Data System (ADS)

Duke, Michael B.; Ignatiev, Alex; Freundlich, Alex; Rosenberg, Sanders D.; Makel, Darby

2001-02-01

A method is described by which silicon photovoltaic (PV) devices can be directly deposited onto the lunar regolith using primarily lunar materials. In sequence, a robotic ``crawler'' moving at slow speed sequentially melts the top layer of regolith and deposits a conducting layer, a doped silicon, a top conducting grid, and an antireflective coating by vacuum evaporation techniques. Concentrated solar energy is utilized as the energy source. Development of this capability would significantly lower the cost of electrical energy on the Moon and would enable a range of other activities, including lower cost propellant production, human outposts with complete food-growth capabilities, and advanced materials production. Low cost energy could affect the economics of propellants in space by allowing the extraction of solar wind hydrogen from the lunar regolith. This would allow the economical export of propellants and other materials to space, first to an Earth-Moon Lagrangian Point and potentially to low Earth orbit. .

Light Manipulation in Organic Photovoltaics

PubMed Central

Ou, Qing‐Dong

2016-01-01

Organic photovoltaics (OPVs) hold great promise for next‐generation photovoltaics in renewable energy because of the potential to realize low‐cost mass production via large‐area roll‐to‐roll printing technologies on flexible substrates. To achieve high‐efficiency OPVs, one key issue is to overcome the insufficient photon absorption in organic photoactive layers, since their low carrier mobility limits the film thickness for minimized charge recombination loss. To solve the inherent trade‐off between photon absorption and charge transport in OPVs, the optical manipulation of light with novel micro/nano‐structures has become an increasingly popular strategy to boost the light harvesting efficiency. In this Review, we make an attempt to capture the recent advances in this area. A survey of light trapping schemes implemented to various functional components and interfaces in OPVs is given and discussed from the viewpoint of plasmonic and photonic resonances, addressing the external antireflection coatings, substrate geometry‐induced trapping, the role of electrode design in optical enhancement, as well as optically modifying charge extraction and photoactive layers. PMID:27840805

High throughput CIGS solar cell fabrication via ultra-thin absorber layer with optical confinement and (Cd, CBD)-free heterojunction partner

DOE Office of Scientific and Technical Information (OSTI.GOV)

Marsillac, Sylvain

2015-11-30

The main objective of this proposal was to use several pathways to reduce the production cost of Cu(In,Ga)Se 2 (CIGS) PV modules and therefore the levelized cost of energy (LCOE) associated with this technology. Three high cost drivers were identified, nominally: 1) Materials cost and availability; 2) Large scale uniformity; 3) Improved throughput These three cost drivers were targeted using the following pathways: 1) Reducing the thickness of the CIGS layer while enhancing materials quality; 2) Developing and applying enhanced in-situ metrology via real time spectroscopic ellipsometry; 3) Looking into alternative heterojunction partner, back contact and anti-reflection (AR) coating Elevenmore » main Tasks were then defined to achieve these goals (5 in Phase 1 and 6 in Phase 2), with 11 Milestones and 2 Go/No-go decision points at the end of Phase 1. The key results are summarized below« less

Semiconductor activated terahertz metamaterials

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Hou-Tong

Metamaterials have been developed as a new class of artificial effective media realizing many exotic phenomena and unique properties not normally found in nature. Metamaterials enable functionality through structure design, facilitating applications by addressing the severe material issues in the terahertz frequency range. Consequently, prototype functional terahertz devices have been demonstrated, including filters, antireflection coatings, perfect absorbers, polarization converters, and arbitrary wavefront shaping devices. Further integration of functional materials into metamaterial structures have enabled actively and dynamically switchable and frequency tunable terahertz metamaterials through the application of external stimuli. The enhanced light-matter interactions in active terahertz metamaterials may result inmore » unprecedented control and manipulation of terahertz radiation, forming the foundation of many terahertz applications. In this paper, we review the progress during the past few years in this rapidly growing research field. We particularly focus on the design principles and realization of functionalities using single-layer and few-layer terahertz planar metamaterials, and active terahertz metamaterials through the integration of semiconductors to achieve switchable and frequency-tunable response.« less

Semiconductor activated terahertz metamaterials

DOE PAGES

Chen, Hou-Tong

2014-08-01

Metamaterials have been developed as a new class of artificial effective media realizing many exotic phenomena and unique properties not normally found in nature. Metamaterials enable functionality through structure design, facilitating applications by addressing the severe material issues in the terahertz frequency range. Consequently, prototype functional terahertz devices have been demonstrated, including filters, antireflection coatings, perfect absorbers, polarization converters, and arbitrary wavefront shaping devices. Further integration of functional materials into metamaterial structures have enabled actively and dynamically switchable and frequency tunable terahertz metamaterials through the application of external stimuli. The enhanced light-matter interactions in active terahertz metamaterials may result inmore » unprecedented control and manipulation of terahertz radiation, forming the foundation of many terahertz applications. In this paper, we review the progress during the past few years in this rapidly growing research field. We particularly focus on the design principles and realization of functionalities using single-layer and few-layer terahertz planar metamaterials, and active terahertz metamaterials through the integration of semiconductors to achieve switchable and frequency-tunable response.« less

Advanced methods for light trapping in optically thin silicon solar cells

NASA Astrophysics Data System (ADS)

Nagel, James Richard

2011-12-01

The field of light trapping is the study of how best to absorb light in a thin film of material when most light either reflects away at the surface or transmits straight through to the other side. This has tremendous application to the field of photovoltaics where thin silicon films can be manufactured cheaply, but also fail to capture all of the available photons in the solar spectrum. Advancements in light trapping therefore bring us closer to the day when photovoltaic devices may reach grid parity with traditional fossil fuels on the electrical energy market. This dissertation advances our understanding of light trapping by first modeling the effects of loss in planar dielectric waveguides. The mathematical framework developed here can be used to model any arbitrary three-layer structure with mixed gain or loss and then extract the total field solution for the guided modes. It is found that lossy waveguides possess a greater number of eigenmodes than their lossless counterparts, and that these "loss guided" modes attenuate much more rapidly than conventional modes. Another contribution from this dissertation is the exploration of light trapping through the use of dielectric nanospheres embedded directly within the active layer of a thin silicon film. The primary benefit to this approach is that the device can utilize a surface nitride layer serving as an antireflective coating while still retaining the benefits of light trapping within the film. The end result is that light trapping and light injection are effectively decoupled from each other and may be independently optimized within a single photovoltaic device. The final contribution from this work is a direct numerical comparison between multiple light trapping schemes. This allows us to quantify the relative performances of various design techniques against one another and objectively determine which ideas tend to capture the most light. Using numerical simulation, this work directly compares the absorption gains due to embedded nanoparticles, surface textures, antireflective coatings, and plasmonic nanospheres. This work also introduces a new mathematical metric for differentiating between index matching and angular scattering at a textured surface. Such information will prove useful in guiding future scientific efforts in the fields of light trapping and light management in thin film photovoltaics.

Al2O3/SiON stack layers for effective surface passivation and anti-reflection of high efficiency n-type c-Si solar cells

NASA Astrophysics Data System (ADS)

Thi Thanh Nguyen, Huong; Balaji, Nagarajan; Park, Cheolmin; Triet, Nguyen Minh; Le, Anh Huy Tuan; Lee, Seunghwan; Jeon, Minhan; Oh, Donhyun; Dao, Vinh Ai; Yi, Junsin

2017-02-01

Excellent surface passivation and anti-reflection properties of double-stack layers is a prerequisite for high efficiency of n-type c-Si solar cells. The high positive fixed charge (Q f) density of N-rich hydrogenated amorphous silicon nitride (a-SiNx:H) films plays a poor role in boron emitter passivation. The more the refractive index ( n ) of a-SiNx:H is decreased, the more the positive Q f of a-SiNx:H is increased. Hydrogenated amorphous silicon oxynitride (SiON) films possess the properties of amorphous silicon oxide (a-SiOx) and a-SiNx:H with variable n and less positive Q f compared with a-SiNx:H. In this study, we investigated the passivation and anti-reflection properties of Al2O3/SiON stacks. Initially, a SiON layer was deposited by plasma enhanced chemical vapor deposition with variable n and its chemical composition was analyzed by Fourier transform infrared spectroscopy. Then, the SiON layer was deposited as a capping layer on a 10 nm thick Al2O3 layer, and the electrical and optical properties were analyzed. The SiON capping layer with n = 1.47 and a thickness of 70 nm resulted in an interface trap density of 4.74 = 1010 cm-2 eV-1 and Q f of -2.59 = 1012 cm-2 with a substantial improvement in lifetime of 1.52 ms after industrial firing. The incorporation of an Al2O3/SiON stack on the front side of the n-type solar cells results in an energy conversion efficiency of 18.34% compared to the one with Al2O3/a-SiNx:H showing 17.55% efficiency. The short circuit current density and open circuit voltage increase by up to 0.83 mA cm-2 and 12 mV, respectively, compared to the Al2O3/a-SiNx:H stack on the front side of the n-type solar cells due to the good anti-reflection and front side surface passivation.

Fabrication of low reflective nanopore-type black Si layer using one-step Ni-assisted chemical etching for Si solar cell application

NASA Astrophysics Data System (ADS)

Takaloo, AshkanVakilipour; Kolahdouz, Mohammadreza; Poursafar, Jafar; Es, Firat; Turan, Rasit; Ki-Joo, Seung

2018-03-01

Nanotextured Si fabricated through metal-assisted chemical etching (MACE) technique exhibits a promising potential for producing antireflective layer for photovoltaic (PV) application. In this study, a novel single-step nickel (Ni) assisted etching technique was applied to produce an antireflective, nonporous Si (black Si) in an aqueous solution containing hydrofluoric acid (HF), hydrogen peroxide (H2O2) and NiSO4 at 40 °C. Field emission scanning electron microscope was used to characterize different morphologies of the textured Si. Optical reflection measurements of samples were carried out to compare the reflectivity of different morphologies. Results indicated that vertical as well as horizontal pores with nanosized diameters were bored in the Si wafer after 1 h treatment in the etching solution containing different molar ratios of H2O2 to HF. Increasing H2O2 concentration in electrochemical etching solution had a considerable influence on the morphology due to higher injection of positive charges from Ni atoms onto the Si surface. Optimized concentration of H2O2 led to formation of an antireflective layer with 2.1% reflectance of incident light.

Lapped substrate for enhanced backsurface reflectivity in a thermophotovoltaic energy conversion system

DOEpatents

Baldasaro, Paul F; Brown, Edward J; Charache, Greg W; DePoy, David M

2000-01-01

A method for fabricating a thermophotovoltaic energy conversion cell including a thin semiconductor wafer substrate (10) having a thickness (.beta.) calculated to decrease the free carrier absorption on a heavily doped substrate; wherein the top surface of the semiconductor wafer substrate is provided with a thermophotovoltaic device (11), a metallized grid (12) and optionally an antireflective (AR) overcoating; and, the bottom surface (10') of the semiconductor wafer substrate (10) is provided with a highly reflecting coating which may comprise a metal coating (14) or a combined dielectric/metal coating (17).

Lapped substrate for enhanced backsurface reflectivity in a thermophotovoltaic energy conversion system

DOEpatents

Baldasaro, Paul F; Brown, Edward J; Charache, Greg W; DePoy, David M

2000-09-05

A method for fabricating a thermophotovoltaic energy conversion cell including a thin semiconductor wafer substrate (10) having a thickness (.beta.) calculated to decrease the free carrier absorption on a heavily doped substrate; wherein the top surface of the semiconductor wafer substrate is provided with a thermophotovoltaic device (11), a metallized grid (12) and optionally an antireflective (AR) overcoating; and, the bottom surface (10') of the semiconductor wafer substrate (10) is provided with a highly reflecting coating which may comprise a metal coating (14) or a combined dielectric/metal coating (17).

Random Surface Texturing of Silicon Dioxide Using Gold Agglomerates

DTIC Science & Technology

2016-07-01

Approved for public release; distribution unlimited. 1 1. Introduction The US Army has been developing new types of photovoltaic ( PV ) devices— solar ...light falling onto the surface of a solar cell is a major optical loss mechanism, which limits the efficiency of the PV .1,2 One method of reducing...in an AR coating on solar cells. 15. SUBJECT TERMS anti-reflective, AR coatings, textured surface structures, silicon dioxide, SiO2 16. SECURITY

Experimental Tests of UltraFlex Array Designs in Low Earth Orbital and Geosynchronous Charging Environments

NASA Technical Reports Server (NTRS)

Galofaro, Joel T.; Vayner, Boris V.; Hillard, Grover B.

2011-01-01

The present ground based investigations give the first definitive look describing the expected on-orbit charging behavior of Orion UltraFlex array coupons in the Low Earth Orbital and Geosynchronous Environments. Furthermore, it is important to note that the LEO charging environment also applies to the International Space Station as well as to the lunar mission charging environments. The GEO charging environment includes the bounding case for all lunar orbital and lunar surface mission environments. The UltraFlex thin film photovoltaic array technology has been targeted to become the sole power system for life support and on-orbit power for the manned Aires Crew Exploration Vehicle. It is therefore, crucial to gain an understanding of the complex charging behavior to answer some of the basic performance and survivability issues in an attempt to ascertain that a single UltraFlex array design will be able to cope with the projected worst case LEO and GEO charging environments. Testing was limited to four array coupons, two coupons each from two different array manufactures, Emcore and Spectrolab. The layout of each array design is identical and varies only in the actual cell technology used. The individual array cells from each manufacturer have an antireflection layered coating and come in two different varieties either uncoated (only AR coating) or coated with a thin conducting ITO layer. The LEO Plasma tests revealed that all four coupons passed the arc threshold -120 V bias tests. GEO electron gun charging tests revealed that only front side area of ITO coated coupons passed tests. Only the Emcore AR array passed backside Stage 2 GEO Tests.

Status of Diffused Junction p(+)n InP Solar Cells for Space Applications

NASA Technical Reports Server (NTRS)

Faur, Mircea; Faur, Maria; Flood, D. J.; Brinker, D. J.; Goradia, C.; Fatemi, N. S.; Jenkins, P. P.; Wilt, D. M.; Bailey, S.

1994-01-01

Recently, we have succeeded in fabricating diffused junction p(+)n(Cd,S) InP solar cells with measured AMO, 25 C open circuit voltage (V(sub OC)) of 887.6 mV, which, to the best of our knowledge, is higher than previously reported V(sub OC) values for any InP homojunction solar cells. The experiment-based projected achievable efficiency of these cells using LEC grown substrates is 21.3%. The maximum AMO, 25 C efficiency recorded to date on bare cells is, however, only 13.2%. This is because of large external and internal losses due to non-optimized front grid design, antireflection (AR) coating and emitter thickness. This paper summarizes recent advances in the technology of fabrication of p(+)n InP diffused structures and solar cells, resulted from a study undertaken in an effort to increase the cell efficiency. The topics discussed in this paper include advances in: 1) the formation of thin p(+) InP:Cd emitter layers, 2) electroplated front contacts, 3) surface passivation and 4) the design of a new native oxide/AI203/MgF2 three layer AR coating using a chemically-grown P-rich passivating oxide as a first layer. Based on the high radiation resistance and the excellent post-irradiation annealing and recovery demonstrated in the early tests done to date, as well as the projected high efficiency and low-cost high-volume fabricability, these cells show a very good potential for space photovoltaic applications.

Novel anti-reflection technology for GaAs single-junction solar cells using surface patterning and Au nanoparticles.

PubMed

Kim, Youngjo; Lam, Nguyen Dinh; Kim, Kangho; Kim, Sangin; Rotermund, Fabian; Lim, Hanjo; Lee, Jaejin

2012-07-01

Single-junction GaAs solar cell structures were grown by low-pressure MOCVD on GaAs (100) substrates. Micro-rod arrays with diameters of 2 microm, 5 microm, and 10 microm were fabricated on the surfaces of the GaAs solar cells via photolithography and wet chemical etching. The patterned surfaces were coated with Au nanoparticles using an Au colloidal solution. Characteristics of the GaAs solar cells with and without the micro-rod arrays and Au nanoparticles were investigated. The short-circuit current density of the GaAs solar cell with 2 microm rod arrays and Au nanoparticles increased up to 34.9% compared to that of the reference cell without micro-rod arrays and Au nanoparticles. The conversion efficiency of the GaAs solar cell that was coated with Au nanoparticles on the patterned surface with micro-rod arrays can be improved from 14.1% to 19.9% under 1 sun AM 1.5G illumination. These results show that micro-rod arrays and Au nanoparticle coating can be applied together in surface patterning to achieve a novel cost-effective anti-reflection technology.

Antireflection coating on metallic substrates for solar energy and display applications

NASA Astrophysics Data System (ADS)

Hsiao, Wei-Yuan; Tang, Chien-Jen; Lee, Kun-Hsien; Jaing, Cheng-Chung; Kuo, Chien-Cheng; Chen, Hsi-Chao; Chang, Hsing-Hua; Lee, Cheng-Chung

2010-08-01

Normally metallic films are required for solar energy and display related coatings. To increase the absorbing efficiency or contrast, it is necessary to apply an antireflection coating (ARC) on the metal substrate. However, the design of a metal substrate is very different from the design of a dielectric substrate, since the optical constant of metallic thin film is very dependent on its thickness and microstructure. In this study, we design and fabricate ARCs on Al substrates using SiO2 and Nb2O5 as the dielectric materials and Nb for the metal films. The ARC successfully deposited on the Al substrate had the following structure: air/SiO2/Nb2O5/Metal/Nb2O5/Al. The measured average reflectance of the ARC is less than 1% in the visible region. We found that it is better to use a highly refractive material than a low refractive material. The thickness of the metallic film can be thicker with the result that it is easier to control and has a lesser total thickness. The total thickness of the ARC is less than 200 nm. We successfully fabricated a solar absorber and OLED device with the ARC structure were successfully fabricated.

Development of a high efficiency thin silicon solar cell. [fabrication and stability tests

NASA Technical Reports Server (NTRS)

Lindmayer, J.

1976-01-01

One hundred thin (120 microns to 260 microns) silicon-aluminum solar cells were fabricated and tested. Silicon slices were prepared, into which an aluminum alloy was evaporated over a range of temperatures and times. Antireflection coatings of tantalum oxide were applied to the cells. Reflectance of the silicon-aluminum interfaces was correlated to alloy temperature (graphs are shown). Optical measurements of the rear surface-internal reflectance of the cells were performed using a Beckman spectrophotometer. An improved gridline pattern was evaluated and stability tests (thermal cycling tests) were performed. Results show that: (1) a high-index, high-transmittance antireflection coating was obtained; (2) the improved metallization of the cells gave a 60 percent rear surface-internal reflectance, and the cells displayed excellent fill factors and blue response of the spectrum; (3) an improved gridline pattern (5 micron linewidths compared to 13 micron linewidths) resulted in a 1.3 percent improvement in short circuit currents; and (4) the stability tests showed no change in cell properties.

Evaluation of glass resin coatings for solar cell applications

NASA Technical Reports Server (NTRS)

Field, M. B.

1978-01-01

Using a variety of non-vacuum deposition techniques coatings were implemented on silicon solar cells and arrays of cells interconnected on Kapton substrates. The coatings provide both antireflection optical matching and environmental protection. Reflectance minima near 2% was achieved at a single wavelength in the visible. Reflectance averaging below 5% across the useful collection range was demonstrated. The coatings and methods of deposition were: (1) Ta2O5 spun, dipped or sprayed; (2) Ta2O5.SiO2 spun, dipped or sprayed; (3) GR908 (SiO2) spun, dipped, or sprayed. Total coating thickness were in the range of 18 microns to 25 microns. The coatings and processes are compatible with single cells or cells mounted on Kapton substrates.

SiC Protective Coating for Photovoltaic Retinal Prostheses

PubMed Central

Lei, Xin; Kane, Sheryl; Cogan, Stuart; Lorach, Henri; Galambos, Ludwig; Huie, Philip; Mathieson, Keith; Kamins, Theodore; Harris, James; Palanker, Daniel

2016-01-01

Objective To evaluate PECVD SiC as a protective coating for retinal prostheses and other implantable devices, and to study their failure mechanisms in vivo. Approach Retinal prostheses were implanted in rats subretinally for up to 1 year. Degradation of implants was characterized by optical and scanning electron microscopy. Dissolution rates of SiC, SiNx and thermal SiO2 were measured in accelerated soaking tests in saline at 87°C. Defects in SiC films were revealed and analyzed by selectively removing the materials underneath those defects. Main results At 87°C SiNx dissolved at 18.3±0.3nm/day, while SiO2 grown at high temperature (1000°C) dissolved at 1.04±0.08A/day. SiC films demonstrated the best stability, with no quantifiable change after 112 days. Defects in thin SiC films appeared primarily over complicated topography and rough surfaces. Significance SiC coatings demonstrating no erosion in accelerated aging test for 112 days at 87°C, equivalent to about 10 years in vivo, can offer effective protection of the implants. Photovoltaic retinal prostheses with PECVD SiC coatings exhibited effective protection from erosion during the 4-month follow-up in vivo. The optimal thickness of SiC layers is about 560nm, as defined by anti-reflective properties and by sufficient coverage to eliminate defects. PMID:27323882

Suppressing lossy-film-induced angular mismatches between reflectance and transmittance extrema: optimum optical designs of interlayers and AR coating for maximum transmittance into active layers of CIGS solar cells.

PubMed

Chang, Yin-Jung

2014-01-13

The investigation of optimum optical designs of interlayers and antireflection (AR) coating for achieving maximum average transmittance (T(ave)) into the CuIn(1-x)Ga(x)Se2 (CIGS) absorber of a typical CIGS solar cell through the suppression of lossy-film-induced angular mismatches is described. Simulated-annealing algorithm incorporated with rigorous electromagnetic transmission-line network approach is applied with criteria of minimum average reflectance (R(ave)) from the cell surface or maximum T(ave) into the CIGS absorber. In the presence of one MgF2 coating, difference in R(ave) associated with optimum designs based upon the two distinct criteria is only 0.3% under broadband and nearly omnidirectional incidence; however, their corresponding T(ave) values could be up to 14.34% apart. Significant T(ave) improvements associated with the maximum-T(ave)-based design are found mainly in the mid to longer wavelengths and are attributed to the largest suppression of lossy-film-induced angular mismatches over the entire CIGS absorption spectrum. Maximum-T(ave)-based designs with a MgF2 coating optimized under extreme deficiency of angular information is shown, as opposed to their minimum-R(ave)-based counterparts, to be highly robust to omnidirectional incidence.

TEM and STEM Studies on the Cross-sectional Morphologies of Dual-/Tri-layer Broadband SiO2 Antireflective Films

NASA Astrophysics Data System (ADS)

Wang, Shuangyue; Yan, Hongwei; Li, Dengji; Qiao, Liang; Han, Shaobo; Yuan, Xiaodong; Liu, Wei; Xiang, Xia; Zu, Xiaotao

2018-02-01

Dual-layer and tri-layer broadband antireflective (AR) films with excellent transmittance were successfully fabricated using base-/acid-catalyzed mixed sols and propylene oxide (PO) modified silica sols. The sols and films were characterized by scanning electron microscope (SEM), Fourier transform infrared spectroscopy (FTIR), nuclear magnetic resonance (NMR), transmission electron microscope (TEM), and scanning transmission electron microscope (STEM). FTIR and TEM results suggest that the PO molecules were covalently bonded to the silica particles and the bridge structure existing in PO modified silica sol is responsible for the low density of the top layer. The density ratio between different layers was measured by cross-sectional STEM, and the results are 1.69:1 and 2.1:1.7:1 from bottom-layer to top-layer for dual-layer and tri-layer films, respectively. The dual-layer film demonstrates good stability with 99.8% at the central wavelength of 351 nm and nearly 99.5% at the central wavelength of 1053 nm in laser system, and for the tri-layer AR film, the maximum transmittance reached nearly 100% at both the central wavelengths of 527 and 1053 nm.

Development of high-efficiency solar cells on silicon web

NASA Technical Reports Server (NTRS)

Meier, D. L.; Greggi, J.; Rai-Choudhury, P.

1986-01-01

Work is reported aimed at identifying and reducing sources of carrier recombination both in the starting web silicon material and in the processed cells. Cross-sectional transmission electron microscopy measurements of several web cells were made and analyzed. The effect of the heavily twinned region on cell efficiency was modeled, and the modeling results compared to measured values for processed cells. The effects of low energy, high dose hydrogen ion implantation on cell efficiency and diffusion length were examined. Cells were fabricated from web silicon known to have a high diffusion length, with a new double layer antireflection coating being applied to these cells. A new contact system, to be used with oxide passivated cells and which greatly reduces the area of contact between metal and silicon, was designed. The application of DLTS measurements to beveled samples was further investigated.

Investigate the effects of EG doping PEDOT/PSS on transmission and anti-reflection properties using terahertz pulsed spectroscopy.

PubMed

Sun, Yiwen; Yang, Shengxin; Du, Pengju; Yan, Fei; Qu, Junle; Zhu, Zexuan; Zuo, Jian; Zhang, Cunlin

2017-02-06

The conductivity of poly(3,4-ethylene dioxythiophene)/poly(4-styrenesulfonate) (PEDOT/PSS) is significantly enhanced on adding some organic solvent such as ethylene glycol (EG). In this paper, the optoelectronic properties of EG doped PEDOT/PSS on transmission and anti-reflection effects are investigated in detail by terahertz time domain spectroscopy (THz-TDS). The transmission line circuit theory gives us an insight into the THz transmission mechanisms of the main and second pulses. In particular, we show that the conductivities of 10% EG doped PEDOT/PSS are nearly frequency independent from 0.3 to 1.5 THz. To demonstrate applications of this property, we design and fabricate broadband terahertz neutral density filters and anti-reflection coatings based on 10% EG doped PEDOT/PSS thin films with varying thickness. Our measurements highlight the capability of THz-TDS to characterize the conductivity of EG doped PEDOT/PSS, which is essential for broadband optoelectronic devices in THz region.

Development of High Efficiency (14%) Solar Cell Array Module

NASA Technical Reports Server (NTRS)

Iles, P. A.; Khemthong, S.; Olah, S.; Sampson, W. J.; Ling, K. S.

1979-01-01

High efficiency solar cells required for the low cost modules was developed. The production tooling for the manufacture of the cells and modules was designed. The tooling consisted of: (1) back contact soldering machine; (2) vacuum pickup; (3) antireflective coating tooling; and (4) test fixture.

Routes for Efficiency Improvement in III-V Photovoltaics

DTIC Science & Technology

2012-05-17

in plasmonic solar cells by combining metallic gratings and antireflection coatings.” Nano Letters 11, (6), 2195-2201 (2011).   2. Sheldon, M.T...Surface Passivation Using Sulfur- and Selenium - Functionalized Surfactants." U.S. Patent Application No. CIT 5912-P, Provisional (filing date June 20

Effect of the Ti/Si ratio of spin coating solutions on surface passivation of crystalline silicon by TiO x -SiO x composite films

NASA Astrophysics Data System (ADS)

Yoshiba, Shuhei; Tanitsu, Katsuya; Suda, Yoshiyuki; Kamisako, Koichi

2017-06-01

Passivation films or antireflection coatings are generally prepared using costly vacuum or high-temperature processes. Thus, we report the preparation of TiO x -SiO x composite films by novel spin coatable solutions for the synthesis of low-cost passivation coating materials. The desired films were formed by varying the mixing ratios of TiO x and SiO x , and the resulting films exhibited excellent surface passivation properties. For the p-type wafer, an optimal effective surface recombination velocity (S eff) of 93 cm/s was achieved at \\text{TiO}x:\\text{SiO}x = 6:4, while a surface recombination current density (J 0s) of 195 fA/cm2 was obtained. In contrast, for the n-type wafer, an S eff of 27 cm/s and a J 0s of 38 fA/cm2 were achieved at \\text{TiO}x:\\text{SiO}x = 8:2. This excellent surface passivation effect could be attributed to the low interface state density and high positive fixed charge density. Furthermore, the thickness of the interfacial SiO x layer was determined to be important for obtaining the desired surface passivation effect.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Afonenko, A A; Dorogush, E S; Malyshev, S A

Using a system of coupled travelling wave equations, in the small-signal regime we analyse frequency and noise characteristics of index- or absorption-coupled distributed feedback laser diodes, as well as of Fabry – Perot (FP) laser diodes. It is shown that the weakest dependence of the direct modulation efficiency on the locking frequency in the regime of strong external optical injection locking is exhibited by a FP laser diode formed by highly reflective and antireflective coatings on the end faces of a laser structure. A reduction in the dependence of output characteristics of the laser diode on the locking frequency canmore » be attained by decreasing the reflection coefficient of the antireflective FP mirror. (control of laser radiation parameters)« less

Hollow carbon spheres in microwaves: Bio inspired absorbing coating

NASA Astrophysics Data System (ADS)

Bychanok, D.; Li, S.; Sanchez-Sanchez, A.; Gorokhov, G.; Kuzhir, P.; Ogrin, F. Y.; Pasc, A.; Ballweg, T.; Mandel, K.; Szczurek, A.; Fierro, V.; Celzard, A.

2016-01-01

The electromagnetic response of a heterostructure based on a monolayer of hollow glassy carbon spheres packed in 2D was experimentally surveyed with respect to its response to microwaves, namely, the Ka-band (26-37 GHz) frequency range. Such an ordered monolayer of spheres mimics the well-known "moth-eye"-like coating structures, which are widely used for designing anti-reflective surfaces, and was modelled with the long-wave approximation. Based on the experimental and modelling results, we demonstrate that carbon hollow spheres may be used for building an extremely lightweight, almost perfectly absorbing, coating for Ka-band applications.

Photovoltaic retinal prosthesis for restoring sight to the blind: implant design and fabrication

NASA Astrophysics Data System (ADS)

Wang, Lele; Mathieson, Keith; Kamins, Theodore I.; Loudin, James; Galambos, Ludwig; Harris, James S.; Palanker, Daniel

2012-03-01

We have designed and fabricated a silicon photodiode array for use as a subretinal prosthesis aimed at restoring sight to patients who lost photoreceptors due to retinal degeneration. The device operates in photovoltaic mode. Each pixel in the two-dimensional array independently converts pulsed infrared light into biphasic electric current to stimulate remaining retinal neurons without a wired power connection. To enhance the maximum voltage and charge injection levels, each pixel contains three photodiodes connected in series. An active and return electrode in each pixel ensure localized current flow and are sputter coated with iridium oxide to provide high charge injection. The fabrication process consists of eight mask layers and includes deep reactive ion etching, oxidation, and a polysilicon trench refill for in-pixel photodiode separation and isolation of adjacent pixels. Simulation of design parameters included TSUPREM4 computation of doping profiles for n+ and p+ doped regions and MATLAB computation of the anti-reflection coating layers thicknesses. The main process steps are illustrated in detail, and problems encountered are discussed. The IV characterization of the device shows that the dark reverse current is on the order of 10-100 pA-negligible compared to the stimulation current; the reverse breakdown voltage is higher than 20 V. The measured photo-responsivity per photodiode is about 0.33A/W at 880 nm.

Phonon impedance matching: minimizing interfacial thermal resistance of thin films

NASA Astrophysics Data System (ADS)

Polanco, Carlos; Zhang, Jingjie; Ghosh, Avik

2014-03-01

The challenge to minimize interfacial thermal resistance is to allow a broad band spectrum of phonons, with non-linear dispersion and well defined translational and rotational symmetries, to cross the interface. We explain how to minimize this resistance using a frequency dependent broadening matrix that generalizes the notion of acoustic impedance to the whole phonon spectrum including symmetries. We show how to ``match'' two given materials by joining them with a single atomic layer, with a multilayer material and with a graded superlattice. Atomic layer ``matching'' requires a layer with a mass close to the arithmetic mean (or spring constant close to the harmonic mean) to favor high frequency phonon transmission. For multilayer ``matching,'' we want a material with a broadening close to the geometric mean to maximize transmission peaks. For graded superlattices, a continuous sequence of geometric means translates to an exponentially varying broadening that generates a wide-band antireflection coating for both the coherent and incoherent limits. Our results are supported by ``first principles'' calculations of thermal conductance for GaAs / Gax Al1 - x As / AlAs thin films using the Non-Equilibrium Greens Function formalism coupled with Density Functional Perturbation Theory. NSF-CAREER (QMHP 1028883), NSF-IDR (CBET 1134311), XSEDE.

Sprayable titanium composition

DOEpatents

Tracy, Chester E.; Kern, Werner; Vibronek, Robert D.

1980-01-01

The addition of 2-ethyl-1-hexanol to an organometallic titanium compound dissolved in a diluent and optionally containing a lower aliphatic alcohol spreading modifier, produces a solution that can be sprayed onto a substrate and cured to form an antireflection titanium oxide coating having a refractive index of from about 2.0 to 2.2.

Solid state radiative heat pump

DOEpatents

Berdahl, P.H.

1984-09-28

A solid state radiative heat pump operable at room temperature (300 K) utilizes a semiconductor having a gap energy in the range of 0.03-0.25 eV and operated reversibly to produce an excess or deficit of change carriers as compared equilibrium. In one form of the invention an infrared semiconductor photodiode is used, with forward or reverse bias, to emit an excess or deficit of infrared radiation. In another form of the invention, a homogenous semiconductor is subjected to orthogonal magnetic and electric fields to emit an excess or deficit of infrared radiation. Three methods of enhancing transmission of radiation the active surface of the semiconductor are disclosed. In one method, an anti-refection layer is coated into the active surface of the semiconductor, the anti-reflection layer having an index of refraction equal to the square root of that of the semiconductor. In the second method, a passive layer is speaced trom the active surface of the semiconductor by a submicron vacuum gap, the passive layer having an index of refractive equal to that of the semiconductor. In the third method, a coupler with a paraboloid reflecting surface surface is in contact with the active surface of the semiconductor, the coupler having an index of refraction about the same as that of the semiconductor.

Fabrication of a Ni nano-imprint stamp for an anti-reflective layer using an anodic aluminum oxide template.

PubMed

Park, Eun-Mi; Lim, Seung-Kyu; Ra, Senug-Hyun; Suh, Su-Jung

2013-11-01

Aluminum anodizing can alter pore diameter, density distribution, periodicity and layer thickness in a controlled way. Because of this property, porous type anodic aluminum oxide (AAO) was used as a template for nano-structure fabrication. The alumina layer generated at a constant voltage increased the pore size from 120 nm to 205 nm according to an increasing process time from 60 min to 150 min. The resulting fabricated AAO templates had pore diameters at or less than 200 nm. Ni was sputtered as a conductive layer onto this AAO template and electroplated using DC and pulse power. Comparing these Ni stamps, those generated from electroplating using on/reverse/off pulsing had an ordered pillar array and maintained the AAO template morphology. This stamp was used for nano-imprinting on UV curable resin coated glass wafer. Surface observations via electron microscopy showed that the nano-imprinted patterned had the same shape as the AAO template. A soft mold was subsequently fabricated and nano-imprinted to form a moth-eye structure on the glass wafer. An analysis of the substrate transmittance using UV-VIS/NIR spectroscopy showed that the transmittance of the substrate with the moth-eye structure was 5% greater that the non-patterned substrate.

Optical and electrical properties of porous silicon layer formed on the textured surface by electrochemical etching

NASA Astrophysics Data System (ADS)

Weiying, Ou; Lei, Zhao; Hongwei, Diao; Jun, Zhang; Wenjing, Wang

2011-05-01

Porous silicon (PS) layers were formed on textured crystalline silicon by electrochemical etching in HF-based electrolyte. Optical and electrical properties of the TMAH textured surfaces with PS formation are studied. Moreover, the influences of the initial structures and the anodizing time on the optical and electrical properties of the surfaces after PS formation are investigated. The results show that the TMAH textured surfaces with PS formation present a dramatic decrease in reflectance. The longer the anodizing time is, the lower the reflectance. Moreover, an initial surface with bigger pyramids achieved lower reflectance in a short wavelength range. A minimum reflectance of 3.86% at 460 nm is achieved for a short anodizing time of 2 min. Furthermore, the reflectance spectrum of the sample, which was etched in 3 vol.% TMAH for 25 min and then anodized for 20 min, is extremely flat and lies between 3.67% and 6.15% in the wavelength range from 400 to 1040 nm. In addition, for a short anodizing time, a slight increase in the effective carrier lifetime is observed. Our results indicate that PS layers formed on a TMAH textured surface for a short anodization treatment can be used as both broadband antireflection coatings and passivation layers for the application in solar cells.

DPAL: Historical Perspective And Summary Of Achievements

DTIC Science & Technology

2013-08-20

of a gas gain medium. The thermal effects existing, for example, in solid state lasers cause aberrations and thermal lensing that degrade the beam...and 500 torr of ethane buffer gas had windows AR coated on both sides (external and internal) and was kept at 98°C. The pump and lasing beams were...back mirror. A 2 cm long cell with antireflection coated windows was filled with metallic cesium and 500 Torr ethane and placed in a heated oven with a

Ultra-thin GaAs single-junction solar cells integrated with a reflective back scattering layer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Weiquan; Becker, Jacob; Liu, Shi

2014-05-28

This paper reports the proposal, design, and demonstration of ultra-thin GaAs single-junction solar cells integrated with a reflective back scattering layer to optimize light management and minimize non-radiative recombination. According to our recently developed semi-analytical model, this design offers one of the highest potential achievable efficiencies for GaAs solar cells possessing typical non-radiative recombination rates found among commercially available III-V arsenide and phosphide materials. The structure of the demonstrated solar cells consists of an In{sub 0.49}Ga{sub 0.51}P/GaAs/In{sub 0.49}Ga{sub 0.51}P double-heterostructure PN junction with an ultra-thin 300 nm thick GaAs absorber, combined with a 5 μm thick Al{sub 0.52}In{sub 0.48}P layer with amore » textured as-grown surface coated with Au used as a reflective back scattering layer. The final devices were fabricated using a substrate-removal and flip-chip bonding process. Solar cells with a top metal contact coverage of 9.7%, and a MgF{sub 2}/ZnS anti-reflective coating demonstrated open-circuit voltages (V{sub oc}) up to 1.00 V, short-circuit current densities (J{sub sc}) up to 24.5 mA/cm{sup 2}, and power conversion efficiencies up to 19.1%; demonstrating the feasibility of this design approach. If a commonly used 2% metal grid coverage is assumed, the anticipated J{sub sc} and conversion efficiency of these devices are expected to reach 26.6 mA/cm{sup 2} and 20.7%, respectively.« less

Ultraviolet /UV/ sensitive phosphors for silicon imaging detectors

NASA Technical Reports Server (NTRS)

Viehmann, W.; Cowens, M. W.; Butner, C. L.

1981-01-01

The fluorescence properties of UV sensitive organic phosphors and the radiometric properties of phosphor coated silicon detectors in the VUV, UV, and visible wavelengths are described. With evaporated films of coronene and liumogen, effective quantum efficiencies of up to 20% have been achieved on silicon photodiodes in the vacuum UV. With thin films of methylmethacrylate (acrylic), which are doped with organic laser dyes and deposited from solution, detector quantum efficiencies of the order of 15% for wavelengths of 120-165 nm and of 40% for wavelengths above 190 nm have been obtained. The phosphor coatings also act as antireflection coatings and thereby enhance the response of coated devices throughout the visible and near IR.

Impact of an AlAs window layer upon the optical properties of Al x Ga1-x As photodiodes

NASA Astrophysics Data System (ADS)

Kang, T.; Chen, X. J.; Johnson, E. B.; Christian, J. F.; Lee, K.; Hammig, M. D.

2016-05-01

Recently developed advanced scintillators, which have the ability to distinguish gamma-ray interaction events from those that accompany neutron impact, require improved quantum efficiency in the blue to near UV region of the spectrum. We utilize GaAs/Al0.8Ga0.2As photodiode elements as components in a wide band-gap solid-state photomultiplier as a lower-cost, lower logistical burden, and higher quantum efficiency replacement for the photomultiplier tube. An AlAs window layer is employed as a means to increase the diode’s optical performance. Relative to structures absent the window layer, simulations and measurements demonstrate that the AlAs layer produces a spatial coincidence between regions of large drift fields with regions of high photon absorption. In addition to the AlAs layer, secondary ion mass spectrometry measurements show that an unexpected high degree of inter-diffusion of GaAs and AlAs quenches the photon-detection efficiency, a decrease that can be avoided by its post-growth removal. With the AlAs layer, the peak external quantum efficiency of 49% is achieved at 450 nm with 10 V reverse bias, which does not fully deplete the device. Simulations show that full depletion can result in efficiencies exceeding 90%. In order to enhance the optical response, a simple anti-reflective coating layer is designed using the existing passivation layer components that successfully minimizes the reflection at the wavelength range of interest (300 nm-500 nm).

Tuning the colors of c-Si solar cells by exploiting plasmonic effects

NASA Astrophysics Data System (ADS)

Peharz, G.; Grosschädl, B.; Prietl, C.; Waldhauser, W.; Wenzl, F. P.

2016-09-01

The color of a crystalline silicon (c-Si) solar cell is mainly determined by its anti-reflective coating. This is a lambda/4 coating made from a transparent dielectric material. The thickness of the anti-reflective coating is optimized for maximal photocurrent generation, resulting in the typical blue or black colors of c-Si solar cells. However, for building-integrated photovoltaic (BiPV) applications the color of the solar cells is demanded to be tunable - ideally by a cheap and flexible coating process on standard (low cost) c-Si solar cells. Such a coating can be realized by applying plasmonic coloring which is a rapidly growing technology for high-quality color filtering and rendering for different fields of application (displays, imaging,…). In this contribution, we present results of an approach for tuning the color of standard industrial c-Si solar cells that is based on coating them with metallic nano-particles. In particular, thin films (< 20 nm) of a metal (e.g., silver) were sputtered onto c-Si solar cells and thermally annealed subsequently. The sizes and the shapes of the nano-particles (characterized by SEM) were found to depend on the thickness of the deposited films and the surface roughness of the substrates/solar cells. With such an approach it is possible to tune the color of the standard c-Si cells from blue to green and brownish/red. The position of the resonance peak in the reflection spectrum was found to be almost independent from the angle of incidence. This low angular sensitivity is a clear advantage compared to alternative color tuning methods, for which additional dielectric thin films are deposited on c-Si solar cells.

Chiral mirror and optical resonator designs for circularly polarized light: suppression of cross-polarized reflectances and transmittances

NASA Astrophysics Data System (ADS)

Hodgkinson, Ian J.; Wu, Qi h.; Arnold, Matthew; McCall, Martin W.; Lakhtakia, Akhlesh

2002-09-01

A left-handed chiral sculptured thin film (STF) that reflects strongly at the wavelength of the circular Bragg resonance tends to partially convert the handedness of incident LCP (left-circularly-polarized) light to RCP (right-circularly-polarized). We show that the cross-polarized component of the reflected RCP beam can be eliminated by interference with an additional RCP beam that is reflected at the interface of an isotropic cover and an AR (antireflecting) layer. For best results the refractive index and thickness of the AR layer need to accommodate a phase change on reflection that occurs at the chiral film. Effective suppression of the reflectances RRR, RRL, RLR and the transmittances TRL, TLR can be achieved by sandwiching the chiral reflector between such amplitude and phase-matched AR coatings. Co-polarized chiral reflectors of this type may form efficient handed optical resonators. For LCP light the optical properties of such a handed resonator are formally the same as the properties of the isotropic passive or active Fabry-Perot resonators, but the handed resonator is transparent to RCP light.

Evolution of zirconyl-stearate Langmuir monolayers and the synthesized ZrO2 thin films with pH

NASA Astrophysics Data System (ADS)

Choudhary, Raveena; Sharma, Rajni; Brar, Loveleen K.

2018-04-01

ZrO2 thin films have a wide range of applications ranging from photonics, antireflection coatings, and resistive oxygen gas sensors, as a gate dielectric and in high temperature fuel cells. We have used the deposition of zirconyl stearate monolayers followed by their oxidation as a method for the synthesis of zirconium oxide thin films. The zirconyl stearate films have been studied and deposited for first time to the best of our knowledge. The Langmuir monolayers are studied using pressure-Area (π-A) isotherms and oscillatory barrier method. The morphology of the films for limited number of layers was studied with FE-SEM to determine the effect of pH on the final ZrO2 film. The 200 layer deposition films show pure monoclinic phase. The films have a band gap ˜6.0eV with a strong PL emission peak is at 490 nm and a weak peak is at 423 nm. So the films formed by this deposition method are suitable for luminescent applications

Status of diffused junction p+n InP solar cells for space applications

NASA Technical Reports Server (NTRS)

Faur, Mircea; Goradia, C.; Faur, Maria; Fatemi, N. S.; Jenkins, P. P.; Flood, D. J.; Brinker, D. J.; Wilt, D. M.; Bailey, S.; Goradia, M.

1994-01-01

Recently, we have succeeded in fabricating diffused junction p(sup +)n(Cd,S) InP solar cells with measured AMO, 25 C open circuit voltage (V(sub OC)) of 887.6 mV, which, to the best of our knowledge, is higher than previously reported V(sub OC) values for any InP homojunction solar cells. The experiment-based projected achievable efficiency of these cells using LEC grown substrates is 21.3 percent. The maximum AMO, 25 C internal losses due to date on bare cells is, however, only 13.2 percent. This is because of large external and internal losses due to non-optimized front grid design, antireflection (AR) coating and emitter thickness. This paper summarizes recent advances in the technology of fabrication of p(sup +)n InP diffused structures and solar cells, resulted from a study undertaken in an effort to increase the cell efficiency. The topics discussed in this paper include advances in: (1) the formation on thin p(sup +) InP:Cd emitter layers, (2) electroplated front contacts, (3) surface passivation and (4) the design of a new native oxide/Al2O3/MgF2 tree layer AR coating using a chemically-grown P-rich passivating oxide as a first layer. Based on the high radiation resistance and the excellent post-irradiation annealing and recovery demonstrated in the early tests done to date, as well as the projected high efficiency and low-cost high-volume fabricability, these cells show a very good potential for space photovoltaic applications.

Status of diffused junction p+n InP solar cells for space applications

DOE Office of Scientific and Technical Information (OSTI.GOV)

Faur, M.; Goradia, C.; Faur, M.

1994-09-01

Recently, the authors have succeeded in fabricating diffused junction p{sup +}n(Cd,S) InP solar cells with measured AMO, 25 C open circuit voltage (V{sub OC}) of 887.6 mV, which, to the best of their knowledge, is higher than previously reported V{sub OC} values for any InP homojunction solar cells. The experiment-based projected achievable efficiency of these cells using LEC grown substrates is 21.3 percent. The maximum AMO, 25 C internal losses due to date on bare cells is, however, only 13.2 percent. This is because of large external and internal losses due to non-optimized front grid design, antireflection (AR) coating andmore » emitter thickness. This paper summarizes recent advances in the technology of fabrication of p{sup +}n InP diffused structures and solar cells, resulted from a study undertaken in an effort to increase the cell efficiency. The topics discussed in this paper include advances in: (1) the formation on thin p{sup +} InP:Cd emitter layers, (2) electroplated front contacts, (3) surface passivation and (4) the design of a new native oxide/Al2O3/MgF2 tree layer AR coating using a chemically-grown P-rich passivating oxide as a first layer. Based on the high radiation resistance and the excellent post-irradiation annealing and recovery demonstrated in the early tests done to date, as well as the projected high efficiency and low-cost high-volume fabricability, these cells show a very good potential for space photovoltaic applications.« less

Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

PubMed Central

2010-01-01

Periodically aligned Si nanopillar (PASiNP) arrays were fabricated on Si substrate via a silver-catalyzed chemical etching process using the diameter-reduced polystyrene spheres as mask. The typical sub-wavelength structure of PASiNP arrays had excellent antireflection property with a low reflection loss of 2.84% for incident light within the wavelength range of 200–1,000 nm. The solar cell incorporated with the PASiNP arrays exhibited a power conversion efficiency (PCE) of ~9.24% with a short circuit current density (JSC) of ~29.5 mA/cm2 without using any extra surface passivation technique. The high PCE of PASiNP array-based solar cell was attributed to the excellent antireflection property of the special periodical Si nanostructure. PMID:21124636

Ophthalmic optical coatings: The real world can be more aggressive than you think

NASA Astrophysics Data System (ADS)

Mildebrath, Mark; Klemm, Karl

2007-01-01

Ophthalmic antireflection coatings are not normally considered to be in the same category as other traditional optical coatings with respect to environmental damage. However, as a group, eyeglass lens wearers tend to subject their optical-coated eyewear to a broader and more aggressive range of environmental aggressions than at first imagined. This paper presents the environmental aggressions and, in some detail, the resultant coating defects observed in coated ophthalmic optics. Further, development of test methods for defect replication, to enable product improvements will be discussed. Real-life environments combine thermal, chemical, and mechanical "aggressions" which spectacle lenses are subjected to. These aggressions generate optical coating defects and failure modes involving abrasion, corrosion, and loss of adhesion. In addition, market forces driven by retail customer perceptions lead to product liabilities not normally considered to be of any consequence in traditional optical coating applications.

Stacking metal nano-patterns and fabrication of moth-eye structure

NASA Astrophysics Data System (ADS)

Taniguchi, Jun

2018-01-01

Nanoimprint lithography (NIL) can be used as a tool for three-dimensional nanoscale fabrication. In particular, complex metal pattern structures in polymer material are demanded as plasmonic effect devices and metamaterials. To fabricate of metallic color filter, we used silver ink and NIL techniques. Metallic color filter was composed of stacking of nanoscale silver disc patterns and polymer layers, thus, controlling of polymer layer thickness is necessary. To control of thickness of polymer layer, we used spin-coating of UV-curable polymer and NIL. As a result, ten stacking layers with 1000 nm layer thickness was obtained and red color was observed. Ultraviolet nanoimprint lithography (UV-NIL) is the most effective technique for mass fabrication of antireflection structure (ARS) films. For the use of ARS films in mobile phones and tablet PCs, which are touch-screen devices, it is important to protect the films from fingerprints and dust. In addition, as the nanoscale ARS that is touched by the hand is fragile, it is very important to obtain a high abrasion resistance. To solve these problems, a UV-curable epoxy resin has been developed that exhibits antifouling properties and high hardness. The high abrasion resistance ARS films are shown to withstand a load of 250 g/cm2 in the steel wool scratch test, and the reflectance is less than 0.4%.

Assessing corrosion problems in photovoltaic cells via electrochemical stress testing

NASA Technical Reports Server (NTRS)

Shalaby, H.

1985-01-01

A series of accelerated electrochemical experiments to study the degradation properties of polyvinylbutyral-encapsulated silicon solar cells has been carried out. The cells' electrical performance with silk screen-silver and nickel-solder contacts was evaluated. The degradation mechanism was shown to be electrochemical corrosion of the cell contacts; metallization elements migrate into the encapsulating material, which acts as an ionic conducting medium. The corrosion products form a conductive path which results in a gradual loss of the insulation characteristics of the encapsulant. The precipitation of corrosion products in the encapsulant also contributes to its discoloration which in turn leads to a reduction in its transparency and the consequent optical loss. Delamination of the encapsulating layers could be attributed to electrochemical gas evolution reactions. The usefulness of the testing technique in qualitatively establishing a reliability difference between metallizations and antireflection coating types is demonstrated.

Kesterite Cu2ZnSn(S,Se)4 Solar Cells with beyond 8% Efficiency by a Sol-Gel and Selenization Process.

PubMed

Liu, Fangyang; Zeng, Fangqin; Song, Ning; Jiang, Liangxing; Han, Zili; Su, Zhenghua; Yan, Chang; Wen, Xiaoming; Hao, Xiaojing; Liu, Yexiang

2015-07-08

A facile sol-gel and selenization process has been demonstrated to fabricate high-quality single-phase earth abundant kesterite Cu2ZnSn(S,Se)4 (CZTSSe) photovoltaic absorbers. The structure and band gap of the fabricated CZTSSe can be readily tuned by varying the [S]/([S] + [Se]) ratios via selenization condition control. The effects of [S]/([S] + [Se]) ratio on device performance have been presented. The best device shows 8.25% total area efficiency without antireflection coating. Low fill factor is the main limitation for the current device efficiency compared to record efficiency device due to high series resistance and interface recombination. By improving film uniformity, eliminating voids, and reducing the Mo(S,Se)2 interfacial layer, a further boost of the device efficiency is expected, enabling the proposed process for fabricating one of the most promising candidates for kesterite solar cells.

Optical management for efficiency enhancement in hybrid organic-inorganic lead halide perovskite solar cells

PubMed Central

Zhang, Hui; Toudert, Johann

2018-01-01

Abstract In a few years only, solar cells using hybrid organic–inorganic lead halide perovskites as optical absorber have reached record photovoltaic energy conversion efficiencies above 20%. To reach and overcome such values, it is required to tailor both the electrical and optical properties of the device. For a given efficient device, optical optimization overtakes electrical one. Here, we provide a synthetic review of recent works reporting or proposing so-called optical management approaches for improving the efficiency of perovskite solar cells, including the use of anti-reflection coatings at the front substrate surface, the design of optical cavities integrated within the device, the incorporation of plasmonic or dielectric nanostructures into the different layers of the device and the structuration of its internal interfaces. We finally give as outlooks some insights into the less-explored management of the perovskite fluorescence and its potential for enhancing the cell efficiency. PMID:29868146

Nanocrystal doped matrixes

DOEpatents

Parce, J. Wallace; Bernatis, Paul; Dubrow, Robert; Freeman, William P.; Gamoras, Joel; Kan, Shihai; Meisel, Andreas; Qian, Baixin; Whiteford, Jeffery A.; Ziebarth, Jonathan

2010-01-12

Matrixes doped with semiconductor nanocrystals are provided. In certain embodiments, the semiconductor nanocrystals have a size and composition such that they absorb or emit light at particular wavelengths. The nanocrystals can comprise ligands that allow for mixing with various matrix materials, including polymers, such that a minimal portion of light is scattered by the matrixes. The matrixes of the present invention can also be utilized in refractive index matching applications. In other embodiments, semiconductor nanocrystals are embedded within matrixes to form a nanocrystal density gradient, thereby creating an effective refractive index gradient. The matrixes of the present invention can also be used as filters and antireflective coatings on optical devices and as down-converting layers. Processes for producing matrixes comprising semiconductor nanocrystals are also provided. Nanostructures having high quantum efficiency, small size, and/or a narrow size distribution are also described, as are methods of producing indium phosphide nanostructures and core-shell nanostructures with Group II-VI shells.

Japanese aerospace science and technology 1992. A bibliography with indexes

NASA Technical Reports Server (NTRS)

1993-01-01

This report contains 4271 annotated references to reports and journal articles of Japaness intellectual origin entered into the NASA scientific and technical information system during 1992. Representative subject areas of interest include: adaptive control, antireflection coatings, fiber reinforced composites, gallium arsenide lasers, laser interferometry, reduced gravity (microgravity), and VHSIC (circuits).

Comparative Sand and Rain Erosion Studies of Spinel, Aluminum Oxynitride (ALON), Magnesium Fluoride, and Germanate Glass

DTIC Science & Technology

1993-08-01

A speed of 206 m/s (406 knots) was chosen for small particles (ព gim) to simulate aircraft cruising conditions. Seven samples (Table 3) were exposed...Infrared Optical Materials and Their Antireflection Coatings, Bristol, Adam Hilger, 1985. 3. S. Musikant . Optical Materials, New York, Marcel Dekker, 1985

Composite Reflective Absorptive IR-Blocking Filters Embedded in Metamaterial Antireflection Coated Silicon

NASA Technical Reports Server (NTRS)

Munson, C. D.; Choi, S. K.; Coughlin, K. P.; McMahon, J. J.; Miller, K. H.; Page, L. A.; Wollack, E. J.

2017-01-01

Infrared (IR)-blocking filters are crucial for controlling the radiative loading on cryogenic systems and for optimizing the sensitivity of bolometric detectors in the far-IR. We present a new IR filter approach based on a combination of patterned frequency-selective structures on silicon and a thin (2575 micron thick) absorptive composite based on powdered reststrahlen absorbing materials. For a 300 K blackbody, this combination reflects approximately 50% of the incoming light and blocks greater than.99.8% of the total power with negligible thermal gradients and excellent low-frequency transmission. This allows a reduction in the IR thermal loading to negligible levels in a single cold filter. These composite filters are fabricated on silicon substrates, which provide excellent thermal transport laterally through the filter and ensure that the entire area of the absorptive filter stays near the bath temperature. A metamaterial antireflection coating cut into these substrates reduces in-band reflections to below 1%, and the in-band absorption of the powder mix is below 1% for signal bands below 750 GHz. This type of filter can be directly incorporated into silicon refractive optical elements.

Fabrication of high edge-definition steel-tape gratings for optical encoders.

PubMed

Ye, Guoyong; Liu, Hongzhong; Yan, Jiawei; Ban, Yaowen; Fan, Shanjin; Shi, Yongsheng; Yin, Lei

2017-10-01

High edge definition of a scale grating is the basic prerequisite for high measurement accuracy of optical encoders. This paper presents a novel fabrication method of steel tape gratings using graphene oxide nanoparticles as anti-reflective grating strips. Roll-to-roll nanoimprint lithography is adopted to manufacture the steel tape with hydrophobic and hydrophilic pattern arrays. Self-assembly technology is employed to obtain anti-reflective grating strips by depositing the graphene oxide nanoparticles on hydrophobic regions. A thin SiO 2 coating is deposited on the grating to protect the grating strips. Experimental results confirm that the proposed fabrication process enables a higher edge definition in making steel-tape gratings, and the new steel tape gratings offer better performance than conventional gratings.

Fabrication of high edge-definition steel-tape gratings for optical encoders

NASA Astrophysics Data System (ADS)

Ye, Guoyong; Liu, Hongzhong; Yan, Jiawei; Ban, Yaowen; Fan, Shanjin; Shi, Yongsheng; Yin, Lei

2017-10-01

High edge definition of a scale grating is the basic prerequisite for high measurement accuracy of optical encoders. This paper presents a novel fabrication method of steel tape gratings using graphene oxide nanoparticles as anti-reflective grating strips. Roll-to-roll nanoimprint lithography is adopted to manufacture the steel tape with hydrophobic and hydrophilic pattern arrays. Self-assembly technology is employed to obtain anti-reflective grating strips by depositing the graphene oxide nanoparticles on hydrophobic regions. A thin SiO2 coating is deposited on the grating to protect the grating strips. Experimental results confirm that the proposed fabrication process enables a higher edge definition in making steel-tape gratings, and the new steel tape gratings offer better performance than conventional gratings.

Optical materials and films applied in industrial lasers

NASA Astrophysics Data System (ADS)

Zhang, Peng; Liu, Shengyong

1999-09-01

Optical materials and films are often used in industrial lasers. Most of industrial lasers work at visible spectrum and near-infrared spectrum. Only CO2 laser works at far- infrared region (10.6 micrometers ). The optical materials and films are categorized in this article, and the properties of the materials and films are related. From visible to infrared spectrum, many optical materials can be used: K9 glass, fused silica, germanium, gallium arsenide, zinc selenide, silicon, copper, and so on. Optical films for lasers include reflection coating, antireflection coating, edge filter, VRM (variable reflectance mirror) coating and polarizer. The characteristic and application of them will be introduced.

Hollow lensing duct

DOEpatents

Beach, Raymond J.; Honea, Eric C.; Bibeau, Camille; Mitchell, Scott; Lang, John; Maderas, Dennis; Speth, Joel; Payne, Stephen A.

2000-01-01

A hollow lensing duct to condense (intensify) light using a combination of focusing using a spherical or cylindrical lens followed by reflective waveguiding. The hollow duct tapers down from a wide input side to a narrow output side, with the input side consisting of a lens that may be coated with an antireflective coating for more efficient transmission into the duct. The inside surfaces of the hollow lens duct are appropriately coated to be reflective, preventing light from escaping by reflection as it travels along the duct (reflective waveguiding). The hollow duct has various applications for intensifying light, such as in the coupling of diode array pump light to solid state lasing materials.

Color properties of transparent and heat-reflecting MgF2-coated indium-tin-oxide films.

PubMed

Hamberg, I; Granqvist, C G

1983-02-15

The visual appearance of antireflection-coated transparent and heat-reflecting indium-tin-oxide (ITO) films on glass was studied by a colorimetric analysis in which the chromaticity coordinates for transmitted and reflected daylight were evaluated for various film thicknesses. A color purity of <1% in normal transmission and <10% in normal reflection could be achieved with ITO thicknesses in the 220-260- or 335-365-nm ranges and MgF2 thicknesses in the 90-105-nm range. These design criteria yield very efficient window coatings with high visual transmittance, low thermal emittance, and little or no perceived color.

Laser-induced damage of coatings on Yb:YAG crystals at cryogenic condition

NASA Astrophysics Data System (ADS)

Wang, He; Zhang, Weili; Chen, Shunli; Zhu, Meiping; He, Hongbo; Fan, Zhengxiu

2011-12-01

As large amounts of heat need to be dissipated during laser operation, some diode pumped solid state lasers (DPSSL), especially Yb:YAG laser, operate at cryogenic condition. This work investigated the laser induced damage of coatings (high-reflective and anti-reflective coatings) on Yb:YAG crystals at cryogenic temperature and room temperature. The results show that the damage threshold of coatings at cryogenic temperature is lower than the one at room temperature. Field-emission scanning electron microscopy (FESEM), optical profiler, step profiler and Atomic force microscope (AFM) were used to obtain the damage morphology, size and depth. Taking alteration of physical parameters, microstructure of coatings and the environmental pollution into consideration, we analyzed the key factor of lowering the coating damage threshold at cryogenic conditions. The results are important to understand the mechanisms leading to damage at cryogenic condition.

Development of a High Efficiency UVR/IRR Coverglass for Triple Junction Solar Cells

NASA Technical Reports Server (NTRS)

Russell, John; Jones, Glenn; Hall, James

2007-01-01

Cover glasses have been a necessary and integral part of space solar arrays since their inception. The main function of the cover glass is to protect the underlying solar cell from the harsh radiation environment of space. They are formed either from fused silica or specially formulated ceria doped glass types that are resistant to radiation damage, for example Pilkington's CMX, CMG, CMO. Solar cells have steadily increased in performance over the past years, from Silicon cells through textured Silicon cells to GaAs cells and the multijunction cells of today. The optimum coverglass solution for each of these cells has been different. The glass itself has also evolved. In some cases it has had its expansion coefficient matched to the cell substrate material, and in addition, added value has been derived from the application of thin film optical coatings to the coverglass. In the majority of cases this has taken the form of a single layer of MgF2 which acts as an antireflection coating. There are also conductive coatings to address electrostatic discharge issues (ESD) and Ultra Violet Reflective (UVR) and Infrared Reflective (IRR) coatings designed for thermal enhancement. Each type of coating can be applied singly or in combination. This paper describes a new type of UVR/IRR (or blue red reflector BRR) specifically designed for triple junction solar cells. For space applications, where radiation is the principal mechanism for removing heat from the satellite, it is the emittance and solar absorptance that primarily determine the temperature of the array. It is therefore essential that any coatings designed to have an effect on the temperature by reducing the solar absorption have a minimal effect on the overall emittance.

Optical damage testing at the Z-Backlighter facility at Sandia National Laboratories

NASA Astrophysics Data System (ADS)

Kimmel, Mark; Rambo, Patrick; Broyles, Robin; Geissel, Matthias; Schwarz, Jens; Bellum, John; Atherton, Briggs

2009-10-01

To enable laser-based radiography of high energy density physics events on the Z-Accelerator[4,5] at Sandia National Laboratories, a facility known as the Z-Backlighter has been developed. Two Nd:Phosphate glass lasers are used to create x-rays and/or proton beams capable of this radiographic diagnosis: Z-Beamlet (a multi-kilojoule laser operating at 527nm in a few nanoseconds) and Z-Petawatt (a several hundred joule laser operating at 1054nm in the subpicosecond regime) [1,2]. At the energy densities used in these systems, it is necessary to use high damage threshold optical materials, some of which are poorly characterized (especially for the sub-picosecond pulse). For example, Sandia has developed a meter-class dielectric coating capability for system optics. Damage testing can be performed by external facilities for nanosecond 532nm pulses, measuring high reflector coating damage thresholds >80J/cm2 and antireflection coating damage thresholds >20J/cm2 [3]. However, available external testing capabilities do not use femtosecond/picosecond scale laser pulses. To this end, we have constructed a sub-picoseond-laser-based optical damage test system. The damage tester system also allows for testing in a vacuum vessel, which is relevant since many optics in the Z-Backlighter system are used in vacuum. This paper will present the results of laser induced damage testing performed in both atmosphere and in vacuum, with 1054nm sub-picosecond laser pulses. Optical materials/coatings discussed are: bare fused silica and protected gold used for benchmarking; BK7; Zerodur; protected silver; and dielectric optical coatings (halfnia/silica layer pairs) produced by Sandia's in-house meter-class coating capability.

Properties of AlF3 and LaF3 films at 193nm

NASA Astrophysics Data System (ADS)

Xue, Chunrong; Shao, Jianda

2010-10-01

In order to develop low loss, high-performance 193nm Fluoride HR mirrors and anti-reflection coatings, LaF3 and AlF3 materials, used for a single-layer coating, were deposited by a molybdenum boat evaporation process. Various microstructures that formed under different substrate temperatures and with deposition rates were investigated. The relation between these microstructures (including cross section morphology, surface roughness and crystalline structure), the optical properties (including refractive index and optical loss) and mechanical properties (stress) were investigated. Furthermore, AlF3 used as a low-index material and LaF3 used as a high-index material were designed and deposited for multilayer coatings. Transmittance, reflectance, stress, and the laser-induced damage threshold (LIDT) were studied. It is shown that AlF3 and LaF3 thin films, deposited on the substrate at a temperature of 300 °C, obtained good quality thin films with high transmittance and little optical loss at 193 nm. For multilayer coatings, the absorption mainly comes from LaF3. Based on these studies, The thickness of 193nm films was controled by a 1/3 baffle with pre-coating technology. the LaF3/AlF3 AR coantings and HR mirrors at 193nm were designed and deposited. Under the present experimental conditions, the reflectance of LaF3/AlF3 HR mirror is up to 96%, and its transmittance is 1.5%. the LaF3/AlF3 AR coanting's residual reflectance is less than 0.14%, and single-sided transmittance is 93.85%. To get a high-performance 193nm AR coating, super-polished substrate is the best choice.

Multifunctional Silicon Optoelectronics Integrated with Plasmonic Scattering Color.

PubMed

Wen, Long; Chen, Qin; Hu, Xin; Wang, Huacun; Jin, Lin; Su, Qiang

2016-12-27

Plasmonic scattering from metallic nanoparticles has been used for centuries to create the colorful appearance of stained glass. Besides their use as passive spectral filtering components, multifunctional optoelectronic applications can be achieved by integrating the nanoscatters with semiconductors that generate electricity using the complementary spectral components of plasmonic colors. To suppress the usual degradation of both efficiency and the gamut of plasmonic scattering coloration in highly asymmetric index configurations like a silicon host, aluminum nanodisks on indium tin oxide (ITO) coated silicon were experimentally studied and demonstrated color sorting in the full visible range along with photocurrent generation. Interestingly, the photocurrents were found to be comparable to the reference devices with only antireflection coatings in spite of the power loss for coloration. Detailed investigation shows that ITO serves as both the impedance matching layer for promoting the backward scattering and schottky contact with silicon, and moreover, plasmonic nanoscatters efficiently harvest the complement spectrum components for charge generation. The present approach combines the capacities of nanoscale color sorting and photoelectric converting at a negligible cost of efficiency, thus providing a broad flexibility of being utilized in various optoelectronic applications including self-powered display, filter-free imaging, and colorful photovoltaics.

The development of an SC1 removable si-anti-reflective-coating

NASA Astrophysics Data System (ADS)

Yamada, Shintaro; Ke, Iou-Sheng; Cutler, Charlotte; Cui, Li; LaBeaume, Paul; Greene, Daniel; Popere, Bhooshan; Sullivan, Chris; Leonard, JoAnne; Coley, Suzanne; Wong, Sabrina; Ongayi, Owendi; Cameron, Jim; Clark, Michael B.; Fitzgibbons, Thomas C.

2018-03-01

A trilayer stack of spin-on-carbon (SOC), silicon anti-reflective coating (SiARC) and photoresist (PR) is often used to enable high resolution implant layers for integrated circuit manufacturing. Damage to substrates from SiARC removal using dry etching or aqueous hydrogen fluoride has increased the demand for innovative SiARC materials for implant lithography process. Wet strippable SiARCs (WS-SiARCs) capable of stripping under mild conditions such as SC1 (ammonium hydroxide/hydrogen peroxide/water) while maintaining key performance metrics of standard SiARCs is highly desirable. Minimizing the formation of Si-O-Si linkages by introducing organic crosslink sites was effective to impart SC1 solubility particularly after O2 dry etching. Incorporation of acidic groups onto the crosslinking site further improved SC1 solubility. A new siloxane polymer architecture that has SC1 active functionality in the polymer backbone was developed to further enhance SC1 solubility. A new SiARC formulation based on the new siloxane polymer achieved equivalent lithographic performances to a classic SiARC and SC1 strip rate >240Å/min under a relatively low concentration SC1 condition such as ammonium hydroxide/hydrogen peroxide/water=1/1/40.

Fire-through Ag contact formation for crystalline Si solar cells using single-step inkjet printing.

PubMed

Kim, Hyun-Gang; Cho, Sung-Bin; Chung, Bo-Mook; Huh, Joo-Youl; Yoon, Sam S

2012-04-01

Inkjet-printed Ag metallization is a promising method of forming front-side contacts on Si solar cells due to its non-contact printing nature and fine grid resolution. However, conventional Ag inks are unable to punch through the SiN(x) anti-reflection coating (ARC) layer on emitter Si surfaces. In this study, a novel formulation of Ag ink is examined for the formation of fire-through contacts on a SiN(x)-coated Si substrate using the single-step printing of Ag ink, followed by rapid thermal annealing at 800 degrees C. In order to formulate Ag inks with fire-through contact formation capabilities, a liquid etching agent was first formulated by dissolving metal nitrates in an organic solvent and then mixing the resulting solution with a commercial Ag nanoparticle ink at various volume ratios. During the firing process, the dissolved metal nitrates decomposed into metal oxides and acted in a similar manner to the glass frit contained in Ag pastes for screen-printed Ag metallization. The newly formulated ink with a 1 wt% loading ratio of metal oxides to Ag formed finely distributed Ag crystallites on the Si substrate after firing at 800 degrees C for 1 min.

Effect of etching parameters on antireflection properties of Si subwavelength grating structures for solar cell applications

NASA Astrophysics Data System (ADS)

Leem, J. W.; Song, Y. M.; Lee, Y. T.; Yu, J. S.

2010-09-01

Silicon (Si) subwavelength grating (SWG) structures were fabricated on Si substrates by holographic lithography and subsequent inductively coupled plasma (ICP) etching process using SiCl4 with or without Ar addition for solar cell applications. To ensure a good nanosized pattern transfer into the underlying Si layer, the etch selectivity of Si over the photoresist mask is optimized by varying the etching parameters, thus improving antireflection characteristics. For antireflection analysis of Si SWG surfaces, the optical reflectivity is measured experimentally and it is also calculated theoretically by a rigorous coupled-wave analysis. The reflectance depends on the height, period, and shape of two-dimensional periodic Si subwavelength structures, correlated with ICP etching parameters. The optimized Si SWG structure exhibits a dramatic decrease in optical reflection of the Si surface over a wide angle of incident light ( θ i ), i.e. less than 5% at wavelengths of 300-1100 nm, leading to good wide-angle antireflection characteristics (i.e. solar-weighted reflection of 1.7-4.9% at θ i <50°) of Si solar cells.

Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching

PubMed Central

Ye, Xin; Jiang, Xiaodong; Huang, Jin; Geng, Feng; Sun, Laixi; Zu, Xiaotao; Wu, Weidong; Zheng, Wanguo

2015-01-01

Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400–700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties. PMID:26268896

Engineering the Complex-Valued Constitutive Parameters of Metamaterials for Perfect Absorption

NASA Astrophysics Data System (ADS)

Wang, Pengwei; Chen, Naibo; Tang, Chaojun; Chen, Jing; Liu, Fanxin; Sheng, Saiqian; Yan, Bo; Sui, Chenghua

2017-04-01

We theoretically studied how to directly engineer the constitutive parameters of metamaterials for perfect absorbers of electromagnetic waves. As an example, we numerically investigated the necessary refractive index n and extinction coefficient k and the relative permittivity ɛ and permeability μ of a metamaterial anti-reflection layer, which could cancel the reflection from a hydrogenated amorphous silicon (α-Si:H) thin film on a metal substrate, within the visible wavelength range from 300 to 800 nm. We found that the metamaterial anti-reflection layer should have a negative refractive index ( n < 0) for short-wavelength visible light but have a positive refractive index ( n > 0) for long-wavelength visible light. The relative permittivity ɛ and permeability μ could be fitted by the Lorentz model, which exhibited electric and magnetic resonances, respectively.

Broadband infrared beam splitter for spaceborne interferometric infrared sounder.

PubMed

Yu, Tianyan; Liu, Dingquan; Qin, Yang

2014-10-01

A broadband infrared beam splitter (BS) on ZnSe substrate used for the spaceborne interferometric infrared sounder (SIIRS) is studied in the spectral range of 4.44-15 μm. Both broadband antireflection coating and broadband beam-splitter coating in this BS are designed and tested. To optimize the optical properties and the stability of the BS, suitable infrared materials were selected, and improved deposition techniques were applied. The designed structures matched experimental data well, and the properties of the BS met the application specification of SIIRS.

Process to form mesostructured films

DOEpatents

Brinker, C. Jeffrey; Anderson, Mark T.; Ganguli, Rahul; Lu, Yunfeng

1999-01-01

This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.

Process to form mesostructured films

DOEpatents

Brinker, C.J.; Anderson, M.T.; Ganguli, R.; Lu, Y.F.

1999-01-12

This invention comprises a method to form a family of supported films with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts. 12 figs.

Solution-deposited F:SnO₂/TiO₂ as a base-stable protective layer and antireflective coating for microtextured buried-junction H₂-evolving Si photocathodes.

PubMed

Kast, Matthew G; Enman, Lisa J; Gurnon, Nicholas J; Nadarajah, Athavan; Boettcher, Shannon W

2014-12-24

Protecting Si photocathodes from corrosion is important for developing tandem water-splitting devices operating in basic media. We show that textured commercial Si-pn(+) photovoltaics protected by solution-processed semiconducting/conducting oxides (plausibly suitable for scalable manufacturing) and coupled to thin layers of Ir yield high-performance H2-evolving photocathodes in base. They also serve as excellent test structures to understand corrosion mechanisms and optimize interfacial electrical contacts between various functional layers. Solution-deposited TiO2 protects Si-pn(+) junctions from corrosion for ∼24 h in base, whereas junctions protected by F:SnO2 fail after only 1 h of electrochemical cycling. Interface layers consisting of Ti metal and/or the highly doped F:SnO2 between the Si and TiO2 reduce Si-emitter/oxide/catalyst contact resistance and thus increase fill factor and efficiency. Controlling the oxide thickness led to record photocurrents near 35 mA cm(-2) at 0 V vs RHE and photocathode efficiencies up to 10.9% in the best cells. Degradation, however, was not completely suppressed. We demonstrate that performance degrades by two mechanisms, (1) deposition of impurities onto the thin catalyst layers, even from high-purity base, and (2) catastrophic failure via pinholes in the oxide layers after several days of operation. These results provide insight into the design of hydrogen-evolving photoelectrodes in basic conditions, and highlight challenges.

Photovoltaic-thermal collectors

DOEpatents

Cox, III, Charles H.

1984-04-24

A photovoltaic-thermal solar cell including a semiconductor body having antireflective top and bottom surfaces and coated on each said surface with a patterned electrode covering less than 10% of the surface area. A thermal-absorbing surface is spaced apart from the bottom surface of the semiconductor and a heat-exchange fluid is passed between the bottom surface and the heat-absorbing surface.

77 FR 8160 - Quality Assurance Requirements for Continuous Opacity Monitoring Systems at Stationary Sources

Federal Register 2010, 2011, 2012, 2013, 2014

2012-02-14

..., glass windows (uncoated or anti-reflection coated, but with no curvature), lenses with mounts where such... requirements must I meet if I use a substitute opacity monitor? In the event that your certified opacity... the above in the maintenance log or in other appropriate permanently maintained records. 10.7 When do...

Molecular Design of Low-Density Multifunctional Hybrid Materials

DTIC Science & Technology

2016-01-01

properties, but also the synergistic interactions of reactive chemical and simulated solar UV environments with the hybrid film which leads to...applications possible including microelectronic interlayer dielectrics, antireflective coatings for solar cells , optical waveguides, size-selective...membranes, biosensors, micro-fluidic structures, and membranes in fuel cells . A critical aspect for all of these applications is that the hybrids

Optimization of Al2O3/TiO2/Al 2O3 Multilayer Antireflection Coating With X-Ray Scattering Techniques

NASA Astrophysics Data System (ADS)

Li, Chao

Broadband multilayer antireflection coatings (ARCs) are keys to improving solar cell efficiencies. The goal of this dissertation is to optimize the multilayer Al2O3/TiO2/Al2O 3 ARC designed for a III-V space multi-junction solar cell with understanding influences of post-annealing and varying deposition parameters on the optical properties. Accurately measuring optical properties is important in accessing optical performances of ARCs. The multilayer Al2O3/TiO 2/Al2O3 ARC and individual Al2O 3 and TiO2 layers were characterized by a novel X-ray reflectivity (XRR) method and a combined method of grazing-incidence small angle X-ray scattering (GISAXS), atomic force microscopy (AFM), and XRR developed in this study. The novel XRR method combining an enhanced Fourier analysis with specular XRR simulation effectively determines layer thicknesses and surface and interface roughnesses and/or grading with sub-nanometer precision, and densities less than three percent uncertainty. Also, the combined method of GISAXS, AFM, and XRR characterizes the distribution of pore size with one-nanometer uncertainty. Unique to this method, the diffuse scattering from surface and interface roughnesses is estimated with surface parameters (root mean square roughness sigma, lateral correlation length ξ, and Hurst parameter h) obtained from AFM, and layer densities, surface grading and interface roughness/grading obtained from specular XRR. It is then separated from pore scattering. These X-ray scattering techniques obtained consistent results and were validated by other techniques including optical reflectance, spectroscopic ellipsometry (SE), glancing incidence X-ray diffraction, transmission electron microscopy and energy dispersive X-ray spectroscopy. The ARCs were deposited by atomic layer deposition with standard parameters at 200 °C. The as-deposited individual Al2O3 layer on Si is porous and amorphous as indicated by the combined methods of GISAXS, AFM, and XRR. Both post-annealing at 400 °C for 40 min in air and varying ALD parameters can eliminate pores, and lead to consistent increases in density and refractive index determined by the XRR method, SE, and optical reflectance measurements. After annealing, the layer remains amorphous. On the other hand, the as-deposited TiO 2 layer is non-porous and amorphous. It is densified and crystallized after annealing at 400 °C for 10 min in air. The multilayer Al2O 3/TiO2/Al2O3 ARC deposited on Si has surface and interface roughnesses and/or grading on the order of one nanometer. Annealing at 400 °C for 10 min in air induces densification and crystallization of the amorphous TiO2 layer as well as possible chemical reactions between TiO2 and Si diffusing from the substrate. On the other hand, Al2O3 layers remain amorphous after annealing. The thickness of the top Al2O3 layer decreases - likely due to interdiffusion between the top two layers and loss of hydrogen from hydroxyl groups initially present in the ALD layers. The thickness of the bottom Al2O3 layer increases, probably due to the diffusion of Si atoms into the bottom layer. In addition, the multilayer Al 2O3/TiO2/Al2O3 ARC was deposited on AlInP (30nm) / GaInP (100nm) / GaAs that includes the topmost layers of III-V multi-junction solar cells. Reflectance below 5 % is achieved within nearly the whole wavelength range of the current-limiting sub-cell. Also, internal scattering occurs in the TiO2 layer possibly associated with the initiated crystallization in the TiO2 layer while absent in the amorphous Al2O3 layers.

Optical reflectance of solution processed quasi-superlattice ZnO and Al-doped ZnO (AZO) channel materials

NASA Astrophysics Data System (ADS)

Buckley, Darragh; McCormack, Robert; O'Dwyer, Colm

2017-04-01

The angle-resolved reflectance of high crystalline quality, c-axis oriented ZnO and AZO single and periodic quasi-superlattice (QSL) spin-coated TFT channels materials are presented. The data is analysed using an adapted model to accurately determine the spectral region for optical thickness and corresponding reflectance. The optical thickness agrees very well with measured thickness of 1-20 layered QSL thin films determined by transmission electron microscopy if the reflectance from lowest interference order is used. Directional reflectance for single layers or homogeneous QSLs of ZnO and AZO channel materials exhibit a consistent degree of anti-reflection characteristics from 30 to 60° (~10-12% reflection) for thickness ranging from ~40 nm to 500 nm. The reflectance of AZO single layer thin films is  <10% from 30 to 75° at 514.5 nm, and  <6% at 632.8 nm from 30-60°. The data show that ZnO and AZO with granular or periodic substructure behave optically as dispersive, continuous thin films of similar thickness, and angle-resolved spectral mapping provides a design rule for transparency or refractive index determination as a function of film thickness, substructure (dispersion) and viewing angle.

Automated aray assembly, phase 2

NASA Technical Reports Server (NTRS)

Daiello, R. V.

1979-01-01

A manufacturing process suitable for the large-scale production of silicon solar array modules at a cost of less than $500/peak kW is described. Factors which control the efficiency of ion implanted silicon solar cells, screen-printed thick film metallization, spray-on antireflection coating process, and panel assembly are discussed. Conclusions regarding technological readiness or cost effectiveness of individual process steps are presented.

Measurements and simulations of the optical gain and anti-reflection coating modal reflectivity in quantum cascade lasers with multiple active region stacks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bidaux, Y., E-mail: yves.bidaux@alpeslasers.ch; Alpes Lasers SA, 1-3 Maximilien-de-Meuron, CH-2000 Neuchatel; Terazzi, R.

2015-09-07

We report spectrally resolved gain measurements and simulations for quantum cascade lasers (QCLs) composed of multiple heterogeneous stacks designed for broadband emission in the mid-infrared. The measurement method is first demonstrated on a reference single active region QCL based on a double-phonon resonance design emitting at 7.8 μm. It is then extended to a three-stack active region based on bound-to-continuum designs with a broadband emission range from 7.5 to 10.5 μm. A tight agreement is found with simulations based on a density matrix model. The latter implements exhaustive microscopic scattering and dephasing sources with virtually no fitting parameters. The quantitative agreement ismore » furthermore assessed by measuring gain coefficients obtained by studying the threshold current dependence with the cavity length. These results are particularly relevant to understand fundamental gain mechanisms in complex semiconductor heterostructure QCLs and to move towards efficient gain engineering. Finally, the method is extended to the measurement of the modal reflectivity of an anti-reflection coating deposited on the front facet of the broadband QCL.« less

Robust antireflection coatings By UV cross-linking of silica nanoparticles and diazo-resin polycation

NASA Astrophysics Data System (ADS)

Ridley, Jason I.; Heflin, James R.; Ritter, Alfred L.

2007-09-01

Antireflection coatings have been fabricated by self-assembly using silica nanoparticles. The ionic self-assembled multilayer (ISAM) films are tightly packed and homogeneous. While the geometric properties of a matrix of spherical particles with corresponding void interstices are highly suitable to meet the conditions for minimal reflectivity, it is also a cause for the lack of cohesion within the constituent body, as well as to the substrate surface. This study investigates methods for improving the interconnectivity of the nanoparticle structure. One such method involves UV curing of diazo-resin (DAR)/silica nanoparticle films, thereby converting the ionic interaction into a stronger covalent bond. Factorial analysis and response surface methods are incorporated to determine factors that affect film properties, and to optimize their optical and adhesive capabilities. The second study looks at the adhesive strength of composite multilayer films. Films are fabricated with silica nanoparticles and poly(allylamine hydrochloride) (PAH), and dipped into aqueous solutions of PAH and poly(methacrylic acid, sodium salt) (PMA) to improve cohesion of silica nanoparticles in the matrix, as well as binding strength to the substrate surface. The results of the two studies are discussed.

Design of a new bottom antireflective coating composition for KrF resist

NASA Astrophysics Data System (ADS)

Mizutani, Kazuyoshi; Momota, Makoto; Aoai, Toshiaki; Yagihara, Morio

1999-06-01

A study for a new organic bottom antireflective coating (BARC) composition is described. A structural design of a light-absorbing dye was most important because dye structure not only plays a role in eliminating reflection from a substrate but also shows influence on dry etch rate of BARC material to a considerable extent. For example, an anthracene moiety with large absorption at 248 nm had undesirable dry etch resistance. 3-Hydroxy-2-naphthoic acid moiety was found to be one of suitable dyes for KrF BARC compositions, and the polymer bearing the dye showed enough absorbance and good erodability in dry etch. The BARC polymer was eroded as one and a half times faster than a novolak resin, and a little faster than an anthracene incorporated polymer. The result was discussed from the concepts of Ohnishi parameter and the ring parameter for dry etch durability of resist materials. BARC polymer should be thermoset by hard bake to eliminate intermixing with resist compositions. The BARC polymer bearing hydroxy group which is useful for a crosslinking reaction was thermoset in the presence of melamine-formaldehyde crosslinker and an acid catalyst after baking over 200 degrees C.

Fabrication of highly uniform and porous MgF2 anti-reflective coatings by polymer-based sol-gel processing on large-area glass substrates.

PubMed

Raut, Hemant Kumar; Dinachali, Saman Safari; Ansah-Antwi, Kwadwo Konadu; Ganesh, V Anand; Ramakrishna, Seeram

2013-12-20

Despite recent progress in the fabrication of magnesium fluoride (MgF2) anti-reflective coatings (ARCs), simple, effective and scalable sol-gel fabrication of MgF2 ARCs for large-area glass substrates has prospective application in various optoelectronic devices. In this paper, a polymer-based sol-gel route was devised to fabricate highly uniform and porous MgF2 ARCs on large-area glass substrates. A sol-gel precursor made of polyvinyl acetate and magnesium trifluoroacetate assisted in the formation of uniformly mesoporous MgF2 ARCs on glass substrates, leading to the attainment of a refractive index of ~1.23. Systematic optimization of the thickness of the ARC in the sub-wavelength regime led to achieving ~99.4% transmittance in the case of the porous MgF2 ARC glass. Precise control of the thickness of porous MgF2 ARC glass also resulted in a mere ~0.1% reflection, virtually eliminating reflection off the glass surface at the target wavelength. Further manipulation of the thickness of the ARC on either side of the glass substrate led to the fabrication of relatively broadband, porous MgF2 ARC glass.

Control of spectral transmission enhancement properties of random anti-reflecting surface structures fabricated using gold masking

NASA Astrophysics Data System (ADS)

Peltier, Abigail; Sapkota, Gopal; Potter, Matthew; Busse, Lynda E.; Frantz, Jesse A.; Shaw, L. Brandon; Sanghera, Jasbinder S.; Aggarwal, Ishwar D.; Poutous, Menelaos K.

2017-02-01

Random anti-reflecting subwavelength surface structures (rARSS) have been shown to suppress Fresnel reflection and scatter from optical surfaces. The structures effectively function as a gradient-refractive-index at the substrate boundary, and the spectral transmission properties of the boundary have been shown to depend on the structure's statistical properties (diameter, height, and density.) We fabricated rARSS on fused silica substrates using gold masking. A thin layer of gold was deposited on the surface of the substrate and then subjected to a rapid thermal annealing (RTA) process at various temperatures. This RTA process resulted in the formation of gold "islands" on the surface of the substrate, which then acted as a mask while the substrate was dry etched in a reactive ion etching (RIE) process. The plasma etch yielded a fused silica surface covered with randomly arranged "rods" that act as the anti-reflective layer. We present data relating the physical characteristics of the gold "island" statistical populations, and the resulting rARSS "rod" population, as well as, optical scattering losses and spectral transmission properties of the final surfaces. We focus on comparing results between samples processed at different RTA temperatures, as well as samples fabricated without undergoing RTA, to relate fabrication process statistics to transmission enhancement values.

Optimization Photodetectors from Zinc Sulfide Deposited on Porous Silicon with Different Doping Metals

NASA Astrophysics Data System (ADS)

Nayef, Uday Muhsin; Khalaf, Haider Amer

In this work, the structural properties of the zinc sulfide (ZnS) films have been investigated using X-ray diffraction (XRD) analysis which show an enhancement in the crystallite degree after doping with copper (Cu). Good matching between the ZnS and porous silicon (PS) structure was noted from the atomic force microscope (AFM) results. The reflectivity gave a clear observation of anti-reflected coating improvement for PS layer and more enhancements after the ZnS deposition. The optical properties show a blue shift in the bandgap for the ZnS deposited with higher substrate temperature and a red shift after doped with different elements. For ZnS/PS heterojunction, the electrical resistivity has been increased after PS layer formed and changed with the variation of the pore size and it was much higher after ZnS deposited on the PS. However, use of ZnS:Cu/PS photodetector showed much higher output current at the ultraviolet (UV) region compared to ZnS/PS. The ZnS:Cu/PS photodetector showed higher output current value than that of the ZnS/PS leading to improvement in the quantum efficiency of 42%.

NDIR gas sensing using high performance AlInSb mid-infrared LEDs as light source

NASA Astrophysics Data System (ADS)

Camargo, E. G.; Goda, Y.; Morohara, O.; Fujita, H.; Geka, H.; Ueno, K.; Shibata, Y.; Kuze, N.

2017-08-01

In this paper, we report the performance of room temperature operated mid-infrared light emitting diode (LED) with an InSb buffer layer and AlInSb active/barrier layers, which showed to be suitable for non-dispersive infrared (NDIR) gas sensing. Characterization of the LED was performed and we found that good carrier confinement and crystalline quality was responsible for its high performance. High efficiency light extraction was obtained by adopting backside emission architecture together with surface roughening treatment and TiO2 anti-reflection coating. The fabricated AlInSb LED showed 75% higher power conversion efficiency when compared with a commercially available device. The developed LED, together with a commercially available infrared (IR) detector equipped with band-pass optical filter (AK9710, manufactured by Asahi Kasei Microdevices) were coupled into a mirror system forming a light path length of 80 mm, which was tested for CO2 gas sensing. For a non-absorbing environment, sensor output of 8 nA was obtained by driving the LED with peak current of 100 mA and, by exposing the system at CO2 concentration of 1000 ppm signal reduction due to absorbance around 12% was obtained.

Lensing duct

DOEpatents

Beach, R.J.; Benett, W.J.

1994-04-26

A lensing duct to condense (intensify) light using a combination of front surface lensing and reflective waveguiding is described. The duct tapers down from a wide input side to a narrow output side, with the input side being lens-shaped and coated with an antireflective coating for more efficient transmission into the duct. The four side surfaces are uncoated, preventing light from escaping by total internal reflection as it travels along the duct (reflective waveguiding). The duct has various applications for intensifying light, such as in the coupling of diode array pump light to solid state lasing materials, and can be fabricated from inexpensive glass and plastic. 3 figures.

The HMDS Coating Flaw Removal Tool

DOE Office of Scientific and Technical Information (OSTI.GOV)

Monticelli, M V; Nostrand, M C; Mehta, N

2008-10-24

In many high energy laser systems, optics with HMDS sol gel antireflective coatings are placed in close proximity to each other making them particularly susceptible to certain types of strong optical interactions. During the coating process, halo shaped coating flaws develop around surface digs and particles. Depending on the shape and size of the flaw, the extent of laser light intensity modulation and consequent probability of damaging downstream optics may increase significantly. To prevent these defects from causing damage, a coating flaw removal tool was developed that deploys a spot of decane with a syringe and dissolves away the coatingmore » flaw. The residual liquid is evacuated leaving an uncoated circular spot approximately 1mm in diameter. The resulting uncoated region causes little light intensity modulation and thus has a low probability of causing damage in optics downstream from the mitigated flaw site.« less

Effect of atomic layer deposited Al2O3:ZnO alloys on thin-film silicon photovoltaic devices

NASA Astrophysics Data System (ADS)

Abdul Hadi, Sabina; Dushaq, Ghada; Nayfeh, Ammar

2017-12-01

In this work, we present the effects of the Al2O3:ZnO ratio on the optical and electrical properties of aluminum doped ZnO (AZO) layers deposited by atomic layer deposition, along with AZO application as the anti-reflective coating (ARC) layer and in heterojunction configurations. Here, we report complex refractive indices for AZO layers with different numbers of aluminum atomic cycles (ZnO:Al2O3 = 1:0, 39:1, 19:1, and 9:1) and we confirm their validity by fitting models to experimental data. Furthermore, the most conductive layer (ZnO:Al2O3 = 19:1, conductivity ˜4.6 mΩ cm) is used to fabricate AZO/n+/p-Si thin film solar cells and AZO/p-Si heterojunction devices. The impact of the AZO layer on the photovoltaic properties of these devices is studied by different characterization techniques, resulting in the extraction of recombination and energy band parameters related to the AZO layer. Our results confirm that AZO 19:1 can be used as a low cost and effective conductive ARC layer for solar cells. However, AZO/p-Si heterojunctions suffer from an insufficient depletion region width (˜100 nm) and recombination at the interface states, with an estimated potential barrier of ˜0.6-0.62 eV. The work function of AZO (ZnO:Al2O3 = 19:1) is estimated to be in the range between 4.36 and 4.57 eV. These material properties limit the use of AZO as an emitter in Si solar cells. However, the results imply that AZO based heterojunctions could have applications as low-cost photodetectors or photodiodes, operating under relatively low reverse bias.

Wafer-Scale Integration of Inverted Nanopyramid Arrays for Advanced Light Trapping in Crystalline Silicon Thin Film Solar Cells.

PubMed

Zhou, Suqiong; Yang, Zhenhai; Gao, Pingqi; Li, Xiaofeng; Yang, Xi; Wang, Dan; He, Jian; Ying, Zhiqin; Ye, Jichun

2016-12-01

Crystalline silicon thin film (c-Si TF) solar cells with an active layer thickness of a few micrometers may provide a viable pathway for further sustainable development of photovoltaic technology, because of its potentials in cost reduction and high efficiency. However, the performance of such cells is largely constrained by the deteriorated light absorption of the ultrathin photoactive material. Here, we report an efficient light-trapping strategy in c-Si TFs (~20 μm in thickness) that utilizes two-dimensional (2D) arrays of inverted nanopyramid (INP) as surface texturing. Three types of INP arrays with typical periodicities of 300, 670, and 1400 nm, either on front, rear, or both surfaces of the c-Si TFs, are fabricated by scalable colloidal lithography and anisotropic wet etch technique. With the extra aid of antireflection coating, the sufficient optical absorption of 20-μm-thick c-Si with a double-sided 1400-nm INP arrays yields a photocurrent density of 39.86 mA/cm(2), which is about 76 % higher than the flat counterpart (22.63 mA/cm(2)) and is only 3 % lower than the value of Lambertian limit (41.10 mA/cm(2)). The novel surface texturing scheme with 2D INP arrays has the advantages of excellent antireflection and light-trapping capabilities, an inherent low parasitic surface area, a negligible surface damage, and a good compatibility for subsequent process steps, making it a good alternative for high-performance c-Si TF solar cells.

.beta.-silicon carbide protective coating and method for fabricating same

DOEpatents

Carey, Paul G.; Thompson, Jesse B.

1994-01-01

A polycrystalline beta-silicon carbide film or coating and method for forming same on components, such as the top of solar cells, to act as an extremely hard protective surface, and as an anti-reflective coating. This is achieved by DC magnetron co-sputtering of amorphous silicon and carbon to form a SiC thin film onto a surface, such as a solar cell. The thin film is then irradiated by a pulsed energy source, such as an excimer laser, to synthesize the poly- or .mu.c-SiC film on the surface and produce .beta.--SiC. While the method of this invention has primary application in solar cell manufacturing, it has application wherever there is a requirement for an extremely hard surface.

Graphene/Si solar cells employing triethylenetetramine dopant and polymethylmethacrylate antireflection layer

NASA Astrophysics Data System (ADS)

Shin, Dong Hee; Jang, Chan Wook; Lee, Ha Seung; Seo, Sang Woo; Kim, Sung; Choi, Suk-Ho

2018-03-01

We report the use of triethylenetetramine (TETA) as a dopant of graphene transparent conducting electrodes (TCEs) for Si heterojunction solar cells. The molar concentration (nD) of TETA is varied from 0.05 to 0.3 mM to optimize the graphene TCEs. The TETA-doped graphene/Si Schottky solar cells show a maximum power-conversion efficiency (PCE) of 4.32% at nD = 0.2 mM, resulting from the enhanced electrical and optical properties, as proved from the nD-dependent behaviors of sheet resistance, transmittance, reflectance, series resistance, and external quantum efficiency. In addition, polymethylmethacrylate is employed as an antireflection layer to enhance the light-trapping effect on graphene/Si solar cells, resulting in further enhancement of the maximum PCE from 4.32 to 5.48%. The loss of the PCE is only within 2% of its original value during 10 days in air.

Improved light extraction efficiency of GaN-based flip-chip light-emitting diodes with an antireflective interface layer

NASA Astrophysics Data System (ADS)

Wu, Dongxue; Ma, Ping; Liu, Boting; Zhang, Shuo; Wang, Junxi; Li, Jinmin

2016-05-01

GaN-based flip-chip light-emitting diodes (FC-LEDs) grown on nanopatterned sapphire substrates (NPSS) are fabricated using self-assembled SiO2 nanospheres as masks during inductively coupled plasma etching. By controlling the pattern spacing, epitaxial GaN can be grown from the top or bottom of patterns to obtain two different GaN/substrate interfaces. The optoelectronic characteristics of FC-LED chips with different GaN/sapphire interfaces are studied. The FC-LED with an antireflective interface layer consisting of a NPSS with GaN in the pattern spacings demonstrates better optical properties than the FC-LED with an interface embedded with air voids. Our study indicates that the two types of FC-LEDs grown on NPSS show higher crystal quality and improved electrical and optical characteristics compared with those of FC-LEDs grown on conventional planar sapphire substrates.

Novel Design of Tunable Microlens with Lowered Driving Voltage and Iris with Conformal Antireflective Surface

NASA Astrophysics Data System (ADS)

Almoallem, Yousuf Dawood

Miniaturizing camera systems as required in many new compact devices places a severe restriction on the device size and power consumption. In modern life nowadays, a daily used compact devices like mobile phones and tablets must have some essential components such as single or multiple tiny cameras, as a component of micro-optical systems. In fact, for most of the current miniaturized cameras, optical power is varied based on the traditional situation where the distances between the lenses are mechanically varied relying on old-fashioned voice coil motors or equivalent mechanical drivers. Spatial and power consumption could be scaled down drastically with much faster response time when the revolutionary alternative liquid tunable microlens is utilized after acquiring a good understanding of microfluidics. The influence of interfacial tension as a key metric in controlling microfluidics systems (e.g. liquid microlens) has drawn considerable attention in biomedical, industrial, military fields over the past decade. Tunable microlenses overcome aforementioned concerns of miniaturizing optical systems and present a viable solution by tuning the focal length of lenses via, for example, variation in the lens curvature. Here, a novel tunable dielectrophoretic (DEP)-based tunable lens is presented. Out of many other mechanisms of tuning the lenses, the dielectric mechanism is especially promising since having the capability to achieve a faster response and overcome the electrolysis issue. Nonetheless, DEP usually requires high driving voltage levels. The proposed design is operating with a lowered voltage level and is based on a tunable dielectric liquid lens with a double-sided electrode design, unlike in the conventional scheme with a single-sided electrode design. The design methodology, geometrical analysis, device fabrication, simulation, and testing are demonstrated. Furthermore, the design, simulation, fabrication and characterization of a black-silicon (BSi) based iris is discussed. Reducing undesirable light stray reflections from surfaces is desired in many 3D optical elements, such as supporting optomechanical mounts, irises, optical filters, solar cells, and photolithography underlying layers. BSi (as antireflective nanostructures) provides a potential economic solution which is highly absorptive across the visible spectrum to replace many currently used yet expensive coating materials. Si nanowires (SiNW) were formed using a metal-assisted chemical (MAC) etching process to get a conformal antireflective property on the iris 3D structure including sharp tips and sidewalls. A significant reduction in undesirable light stray reflections was achieved as a result of successful implementation of the conformal antireflective surface on all facets of fabricated irises to eliminate undesirable light stray reflections.

Room temperature operation of mid-infrared InAs0.81Sb0.19 based photovoltaic detectors with an In0.2Al0.8Sb barrier layer grown on GaAs substrates.

PubMed

Geum, Dae-Myeong; Kim, SangHyeon; Kang, SooSeok; Kim, Hosung; Park, Hwanyeol; Rho, Il Pyo; Ahn, Seung Yeop; Song, Jindong; Choi, Won Jun; Yoon, Euijoon

2018-03-05

In this paper, InAs 0.81 Sb 0.19 -based hetero-junction photovoltaic detector (HJPD) with an In 0.2 Al 0.8 Sb barrier layer was grown on GaAs substrates. By using technology computer aided design (TCAD), a design of a barrier layer that can achieve nearly zero valance band offsets was accomplished. A high quality InAs 0.81 Sb 0.19 epitaxial layer was obtained with relatively low threading dislocation density (TDD), calculated from a high-resolution X-ray diffraction (XRD) measurement. This layer showed a Hall mobility of 15,000 cm 2 /V⋅s, which is the highest mobility among InAsSb layers with an Sb composition of around 20% grown on GaAs substrates. Temperature dependence of dark current, photocurrent response and responsivity were measured and analyzed for fabricated HJPD. HJPD showed the clear photocurrent response having a long cutoff wavelength of 5.35 μm at room temperature. It was observed that the dark current of HJPDs is dominated by the diffusion limited current at temperatures ranging from 200K to room temperature from the dark current analysis. Peak responsivity of HJPDs exhibited the 1.18 A/W and 15 mA/W for 83K and a room temperature under zero bias condition even without anti-reflection coating (ARC). From these results, we believe that HJPDs could be an appropriate PD device for future compact and low power dissipation mid-infrared on-chip sensors and imaging devices.

Optical analysis of a III-V-nanowire-array-on-Si dual junction solar cell.

PubMed

Chen, Yang; Höhn, Oliver; Tucher, Nico; Pistol, Mats-Erik; Anttu, Nicklas

2017-08-07

A tandem solar cell consisting of a III-V nanowire subcell on top of a planar Si subcell is a promising candidate for next generation photovoltaics due to the potential for high efficiency. However, for success with such applications, the geometry of the system must be optimized for absorption of sunlight. Here, we consider this absorption through optics modeling. Similarly, as for a bulk dual-junction tandem system on a silicon bottom cell, a bandgap of approximately 1.7 eV is optimum for the nanowire top cell. First, we consider a simplified system of bare, uncoated III-V nanowires on the silicon substrate and optimize the absorption in the nanowires. We find that an optimum absorption in 2000 nm long nanowires is reached for a dense array of approximately 15 nanowires per square micrometer. However, when we coat such an array with a conformal indium tin oxide (ITO) top contact layer, a substantial absorption loss occurs in the ITO. This ITO could absorb 37% of the low energy photons intended for the silicon subcell. By moving to a design with a 50 nm thick, planarized ITO top layer, we can reduce this ITO absorption to 5%. However, such a planarized design introduces additional reflection losses. We show that these reflection losses can be reduced with a 100 nm thick SiO 2 anti-reflection coating on top of the ITO layer. When we at the same time include a Si 3 N 4 layer with a thickness of 90 nm on the silicon surface between the nanowires, we can reduce the average reflection loss of the silicon cell from 17% to 4%. Finally, we show that different approximate models for the absorption in the silicon substrate can lead to a 15% variation in the estimated photocurrent density in the silicon subcell.

Optical Evaluation of Digital Micromirror Devices (DMDs) with UV-Grade Fused Silica, Sapphire, and Magnesium Fluoride Windows and Longterm Reflectance of Bare Devices

NASA Technical Reports Server (NTRS)

Quijada, Manuel A.; Travinsky, Anton; Vorobiev, Dmitry; Ninkov, Zoran; Raisanen, Alan; Robberto, Massimo; Heap, Sara

2016-01-01

Digital micromirror devices (DMDs) are commercial micro-electromechanical systems, consisting of millions of mirrors which can be individually addressed and tilted into one of two states (+/-12deg). These devices were developed to create binary patterns in video projectors, in the visible range. Commercially available DMDs are hermetically sealed and extremely reliable. Recently, DMDs have been identified as an alternative to microshutter arrays for space-based multi-object spectrometers (MOS). Specifically, the MOS at the heart of the proposed Galactic Evolution Spectroscopic Explorer (GESE) uses the DMD as a reprogrammable slit mask. Unfortunately, the protective borosilicate windows limit the use of DMDs in the UV and IR regimes, where the glass has insufficient throughput. In this work, we present our efforts to replace standard DMD windows with custom windows made from UV-grade fused silica, low-absorption optical sapphire (LAOS) and magnesium fluoride (MgF2). We present transmission measurements of the antireflection coated windows and the reflectance of bare (window removed) DMDs. Furthermore, we investigated the long-term stability of the DMD reflectance and experiments for coating DMD active area with a layer of pure aluminum (Al) to boost reflectance performance in the UV spectral range (200-400 nm).

Optical evaluation of digital micromirror devices (DMDs) with UV-grade fused silica, sapphire, and magnesium fluoride windows and long-term reflectance of bare devices

NASA Astrophysics Data System (ADS)

Quijada, Manuel A.; Travinsky, Anton; Vorobiev, Dmitry; Ninkov, Zoran; Raisanen, Alan; Robberto, Massimo; Heap, Sara

2016-07-01

Digital micromirror devices (DMDs) are commercial micro-electromechanical systems, consisting of millions of mirrors which can be individually addressed and tilted into one of two states (+/-12°). These devices were developed to create binary patterns in video projectors, in the visible range. Commercially available DMDs are hermetically sealed and extremely reliable. Recently, DMDs have been identified as an alternative to microshutter arrays for space-based multi-object spectrometers (MOS). Specifically, the MOS at the heart of the proposed Galactic Evolution Spectroscopic Explorer (GESE) uses the DMD as a reprogrammable slit mask. Unfortunately, the protective borosilicate windows limit the use of DMDs in the UV and IR regimes, where the glass has insufficient throughput. In this work, we present our efforts to replace standard DMD windows with custom windows made from UV-grade fused silica, low-absorption optical sapphire (LAOS) and magnesium fluoride (MgF2). We present transmission measurements of the antireflection coated windows and the reflectance of bare (window removed) DMDs. Furthermore, we investigated the long-term stability of the DMD reflectance and experiments for coating DMD active area with a layer of pure aluminum (Al) to boost reflectance performance in the UV spectral range (200-400 nm).

Adaptive Optoelectronic Eyes: Hybrid Sensor/Processor Architectures

DTIC Science & Technology

2006-11-13

corresponding calculated data. The width of the mirror stopband is proportional to the refractive index difference between the high and low index materials ...Silicon VLSI Neuron Unit Arrays 56 Development of a Single-Sided Flip-Chip Bonding Process 65 Development of High Refractive Index Diffractive Optical ...Elements (DOEs) 68 Development of High-Performance Antireflection Coatings for High Refractive Index DOEs 69 Design and Fabrication of Low Threshold

Annealed CVD molybdenum thin film surface

DOEpatents

Carver, Gary E.; Seraphin, Bernhard O.

1984-01-01

Molybdenum thin films deposited by pyrolytic decomposition of Mo(CO).sub.6 attain, after anneal in a reducing atmosphere at temperatures greater than 700.degree. C., infrared reflectance values greater than reflectance of supersmooth bulk molybdenum. Black molybdenum films deposited under oxidizing conditions and annealed, when covered with an anti-reflecting coating, approach the ideal solar collector characteristic of visible light absorber and infrared energy reflector.

Improved laser damage threshold for chalcogenide glasses through surface microstructuring

NASA Astrophysics Data System (ADS)

Florea, Catalin; Sanghera, Jasbinder; Busse, Lynda; Shaw, Brandon; Aggarwal, Ishwar

2011-03-01

We demonstrate improved laser damage threshold of chalcogenide glasses with microstructured surfaces as compared to chalcogenide glasses provided with traditional antireflection coatings. The surface microstructuring is used to reduce Fresnel losses over large bandwidths in As2S3 glasses and fibers. The treated surfaces show almost a factor of two of improvement in the laser damage threshold when compared with untreated surfaces.

Status of silicon solar cell technology

NASA Technical Reports Server (NTRS)

Brandhorst, H. W., Jr.

1976-01-01

Major progress in solar cell technology leading to increased efficiency has occurred since 1970. Technical approaches leading to this increased output include surface texturing, improved antireflection coatings, reduced grid pattern area coverage, shallow junctions and back surface fields. The status of these developments and their incorporation into cell production is discussed. Future research and technology trends leading to further efficiency increases and substantial cost reductions are described.

Development of a high efficiency thin silicon solar cell

NASA Technical Reports Server (NTRS)

Lindmayer, J.; Wrigley, C. Y.

1977-01-01

A key to the success of this program was the breakthrough development of a technology for producing ultra-thin silicon slices which are very flexible, resilient, and tolerant of moderate handling abuse. Experimental topics investigated were thinning technology, gaseous junction diffusion, aluminum back alloying, internal reflectance, tantalum oxide anti-reflective coating optimization, slice flexibility, handling techniques, production rate limiting steps, low temperature behavior, and radiation tolerance.

Quantum efficiency and dark current evaluation of a backside illuminated CMOS image sensor

NASA Astrophysics Data System (ADS)

Vereecke, Bart; Cavaco, Celso; De Munck, Koen; Haspeslagh, Luc; Minoglou, Kyriaki; Moore, George; Sabuncuoglu, Deniz; Tack, Klaas; Wu, Bob; Osman, Haris

2015-04-01

We report on the development and characterization of monolithic backside illuminated (BSI) imagers at imec. Different surface passivation, anti-reflective coatings (ARCs), and anneal conditions were implemented and their effect on dark current (DC) and quantum efficiency (QE) are analyzed. Two different single layer ARC materials were developed for visible light and near UV applications, respectively. QE above 75% over the entire visible spectrum range from 400 to 700 nm is measured. In the spectral range from 260 to 400 nm wavelength, QE values above 50% over the entire range are achieved. A new technique, high pressure hydrogen anneal at 20 atm, was applied on photodiodes and improvement in DC of 30% for the BSI imager with HfO2 as ARC as well as for the front side imager was observed. The entire BSI process was developed 200 mm wafers and evaluated on test diode structures. The knowhow is then transferred to real imager sensors arrays.

Processes for producing low cost, high efficiency silicon solar cells

DOEpatents

Rohatgi, Ajeet; Chen, Zhizhang; Doshi, Parag

1996-01-01

Processes which utilize rapid thermal processing (RTP) are provided for inexpensively producing high efficiency silicon solar cells. The RTP processes preserve minority carrier bulk lifetime .tau. and permit selective adjustment of the depth of the diffused regions, including emitter and back surface field (bsf), within the silicon substrate. Silicon solar cell efficiencies of 16.9% have been achieved. In a first RTP process, an RTP step is utilized to simultaneously diffuse phosphorus and aluminum into the front and back surfaces, respectively, of a silicon substrate. Moreover, an in situ controlled cooling procedure preserves the carrier bulk lifetime .tau. and permits selective adjustment of the depth of the diffused regions. In a second RTP process, both simultaneous diffusion of the phosphorus and aluminum as well as annealing of the front and back contacts are accomplished during the RTP step. In a third RTP process, the RTP step accomplishes simultaneous diffusion of the phosphorus and aluminum, annealing of the contacts, and annealing of a double-layer antireflection/passivation coating SiN/SiO.sub.x.

Method for forming p-n junctions and solar-cells by laser-beam processing

DOEpatents

Narayan, Jagdish; Young, Rosa T.

1979-01-01

This invention is an improved method for preparing p-n junction devices, such as diodes and solar cells. High-quality junctions are prepared by effecting laser-diffusion of a selected dopant into silicon by means of laser pulses having a wavelength of from about 0.3 to 1.1 .mu.m, an energy area density of from about 1.0 to 2.0 J/cm.sup.2, and a duration of from about 20 to 60 nanoseconds. Initially, the dopant is deposited on the silicon as a superficial layer, preferably one having a thickness in the range of from about 50 to 100 A. Depending on the application, the values for the above-mentioned pulse parameters are selected to produce melting of the silicon to depths in the range from about 1000 A to 1 .mu.m. The invention has been used to produce solar cells having a one-sun conversion efficiency of 10.6%, these cells having no antireflective coating or back-surface fields.

GaAs Solar Cells Grown on Unpolished, Spalled Ge Substrates: Preprint

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cavalli, Alessandro; Johnston, Steven; Sulas, Dana

Decreasing the cost of single-crystal substrates by wafer reuse techniques has long been sought for III-V solar cells. Controlled spalling of III-V devices is a possible pathway for epitaxial liftoff, which would help reduce costs, but chemo- mechanical polishing after liftoff tends to limit the potential cost savings. Growth on an unpolished spalled surface would be an additional step toward lower costs, but it is crucial to show high efficiency solar cell devices on these unprocessed substrates. In this study, we spalled 2-inch Ge wafers using a Ni stressor layer, and then grew GaAs solar cells by HVPE on themore » spalled Ge surface without any other surface treatment. We show a 12.8% efficient single-junction device, without anti-reflection coating, with quantum efficiency very close to identical devices grown by HVPE on non-spalled GaAs substrates. Demonstrating a high carrier collection on unpolished spalled wafers is a step toward reducing substrate-related liftoff and reuse costs.« less

22.7% efficient PERL silicon solar cell module with a textured front surface

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhao, J.; Wang, A.; Campbell, P.

1997-12-31

This paper describes a solar cell module efficiency of 22.7% independently measured at Sandia National Laboratories. This is the highest ever confirmed efficiency for a photovoltaic module of this size achieved by cells made from any material. This 778-cm{sup 2} module used 40 large-area double layer antireflection coated PERL (passivated emitter, rear locally-diffused) silicon cells of average efficiency of 23.1%. A textured front module surface considerably improve the module efficiency. Also reported is an independently confirmed efficiency of 23.7% for a 21.6 cm{sup 2} cell of the type used in the module. Using these PERL cells in the 1996 Worldmore » Solar Challenge solar car race from Darwin to Adelaide across Australia, Honda`s Dream and Aisin Seiki`s Aisol III were placed first and third, respectively. Honda also set a new record by reaching Adelaide in four days with an average speed of 90km/h over the 3010 km course.« less

One-dimensional dielectric bi-periodic photonic structures based on ternary photonic crystals

NASA Astrophysics Data System (ADS)

Dadoenkova, Nataliya N.; Dadoenkova, Yuliya S.; Panyaev, Ivan S.; Sannikov, Dmitry G.; Lyubchanskii, Igor L.

2018-01-01

We investigate the transmittivity spectra, fields, and energy distribution of the electromagnetic eigenwaves propagating in a one-dimensional (1D) dielectric photonic crystal [(TiO2/SiO2)NAl2O3]M with two periods formed by unit cells TiO2/SiO2 and (TiO2/SiO2)NAl2O3. Spectra of TE- and TM-modes depend on the geometric parameters of the structure and undergo modifications with the change in the period numbers, layer thicknesses, and incidence angle. Special attention is paid to the applicability of the hybrid effective medium approximation comprising the long-wave approximation and two-dimensional (2 × 2) transfer matrix method. We demonstrate spectral peculiarities of the bi-periodic structure and also show the differences between the band gap spectra of the bi-periodic and ternary 1D dielectric photonic crystals. The presented photonic crystal structure can find its applications in optoelectronics and nanophotonics areas as omnidirectional reflectors, optical ultra-narrow bandpass filters, and antireflection coatings.

Zinc-oxide-based nanostructured materials for heterostructure solar cells

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bobkov, A. A.; Maximov, A. I.; Moshnikov, V. A., E-mail: vamoshnikov@mail.ru

Results obtained in the deposition of nanostructured zinc-oxide layers by hydrothermal synthesis as the basic method are presented. The possibility of controlling the structure and morphology of the layers is demonstrated. The important role of the procedure employed to form the nucleating layer is noted. The faceted hexagonal nanoprisms obtained are promising for the fabrication of solar cells based on oxide heterostructures, and aluminum-doped zinc-oxide layers with petal morphology, for the deposition of an antireflection layer. The results are compatible and promising for application in flexible electronics.

Review of rigorous coupled-wave analysis and of homogeneous effective medium approximations for high spatial-frequency surface-relief gratings

NASA Technical Reports Server (NTRS)

Glytsis, Elias N.; Brundrett, David L.; Gaylord, Thomas K.

1993-01-01

A review of the rigorous coupled-wave analysis as applied to the diffraction of electro-magnetic waves by gratings is presented. The analysis is valid for any polarization, angle of incidence, and conical diffraction. Cascaded and/or multiplexed gratings as well as material anisotropy can be incorporated under the same formalism. Small period rectangular groove gratings can also be modeled using approximately equivalent uniaxial homogeneous layers (effective media). The ordinary and extraordinary refractive indices of these layers depend on the gratings filling factor, the refractive indices of the substrate and superstrate, and the ratio of the freespace wavelength to grating period. Comparisons of the homogeneous effective medium approximations with the rigorous coupled-wave analysis are presented. Antireflection designs (single-layer or multilayer) using the effective medium models are presented and compared. These ultra-short period antireflection gratings can also be used to produce soft x-rays. Comparisons of the rigorous coupled-wave analysis with experimental results on soft x-ray generation by gratings are also included.

Moth eye-inspired anti-reflective surfaces for improved IR optical systems & visible LEDs fabricated with colloidal lithography and etching.

PubMed

Chan, Lesley W; Morse, Daniel E; Gordon, Michael J

2018-05-08

Near- and sub-wavelength photonic structures are used by numerous organisms (e.g. insects, cephalopods, fish, birds) to create vivid and often dynamically-tunable colors, as well as create, manipulate, or capture light for vision, communication, crypsis, photosynthesis, and defense. This review introduces the physics of moth eye (ME)-like, biomimetic nanostructures and discusses their application to reduce optical losses and improve efficiency of various optoelectronic devices, including photodetectors, photovoltaics, imagers, and light emitting diodes. Light-matter interactions at structured and heterogeneous surfaces over different length scales are discussed, as are the various methods used to create ME-inspired surfaces. Special interest is placed on a simple, scalable, and tunable method, namely colloidal lithography with plasma dry etching, to fabricate ME-inspired nanostructures in a vast suite of materials. Anti-reflective surfaces and coatings for IR devices and enhancing light extraction from visible light emitting diodes are highlighted.

Biophotonic applications of eigenchannels in a scattering medium (Conference Presentation)

NASA Astrophysics Data System (ADS)

Kim, Moonseok; Choi, Wonjun; Choi, Youngwoon; Yoon, Changhyeong; Choi, Wonshik

2016-03-01

When waves travel through disordered media such as ground glass and skin tissues, they are scattered multiple times. Most of the incoming energy bounces back at the superficial layers and only a small fraction can penetrate deep inside. This has been a limiting factor for the working depth of various optical techniques. We present a systematic method to enhance wave penetration to the scattering media. Specifically, we measured the reflection matrix of a disordered medium with wide angular coverage for each orthogonal polarization states. From the reflection matrix, we identified reflection eigenchannels of the medium, and shaped the incident wave into the reflection eigenchannel with smallest eigenvalue, which we call anti-reflection mode. This makes reflectance reduced and wave penetration increased as a result of the energy conservation. We demonstrated transmission enhancement by more than a factor of 3 by the coupling of the incident waves to the anti-reflection modes. Based on the uneven distribution of eigenvalues of reflection eigenchannels, we further developed an iterative feedback control method for finding and coupling light to anti-reflection modes. Since this adaptive control method can keep up with sample perturbation, it promotes the applicability of exploiting reflection eigenchannels. Our approach of delivering light deep into the scattering media will contribute to enhancing the sensitivity of detecting objects hidden under scattering layers, which is universal problem ranging from geology to life science.

Diamondlike carbon applications in infrared optics and microelectronics

NASA Technical Reports Server (NTRS)

Woollam, John A.; De, Bhola N.; Orzeszko, S.; Ianno, N. J.; Snyder, Paul G.; Alterovitz, Samuel A.; Pouch, John J.; Wu, R. L. C.; Ingram, D. C.

1990-01-01

The use of diamondlike carbon (DLC) as a protective coating in harsh environments is addressed. There are three topics presented. The first is a description of the preparation of DLC on seven different infrared transmitting materials, and the possibility of using DLC as an antireflecting coating at commonly used wavelengths. DLC doesn't bond easily to all materials, and special techniques for bonding are presented. The second topic deals with how well DLC will protect a substrate from moisture penetration. This is an important aspect in numerous uses of DLC, including both infrared optics and integrated circuits. The third topic is the effect of particulate impact on film performance and integrity.

An Optically Pumped Far-Infrared Folded Mirror-Less Cavity

NASA Astrophysics Data System (ADS)

Liu, Chuang; Wang, Dashuai; Zhang, Peng; Qu, Yanchen

2017-12-01

A compact and efficient mirror-less cavity is presented for an optically pumped 192-μm far-infrared laser. With a gold-coated mirror and 30°-inclined anti-reflection coated Ge plate serving as highly reflective mirrors, a folded mirror-less CH3F cavity is achieved. Maximum energy of 0.72 mJ is obtained with the pump energy of 600 mJ, which gives an energy increment of 75% in comparison with the previous 1.85-m mirror-less system. The beam divergence angle of the FIR radiation from this folded mirror-less cavity is measured to be 14.2 mrad.

Innovative Facet Passivation for High-Brightness Laser Diodes

DTIC Science & Technology

2016-02-05

and anti-reflection (AR) coatings are deposited after cleaving. Edge- emitting laser diodes emit very high optical powers from small emission areas, as...SECURITY CLASSIFICATION OF: The objective of this effort is to increase the power of low fill-factor (20%) laser diode (LD) bars from the present...2012 16-Nov-2015 Approved for Public Release; Distribution Unlimited Final Report: Innovative Facet Passivation for High-Brightness Laser Diodes The

A new lightweight solar cell

NASA Technical Reports Server (NTRS)

Lindmayer, J.; Wrigley, C.

1976-01-01

Highly reproducible, very thin (40-80 microns thick) silicon solar cells are examined. These cells are the product of silicon thinning techniques that produce very flexible, resilient slices as compared to other techniques. Measurements on solar cells 2 cm by 2 cm by 50 microns thick producing 60 mW or more at AM0 are described. These cells have fine-line metallizations, tantalum oxide antireflection coatings and back-surface aluminum alloy.

Diamond-like nanocomposite: a novel promising carbon based thin film as antireflection and passivation coating for silicon solar cell

NASA Astrophysics Data System (ADS)

Jana, Sukhendu; Das, Sayan; De, Debasish; Mondal, Anup; Gangopadhyay, Utpal

2018-02-01

Presently, silicon nitride (SiN x ) is widely used as antireflection coating (ARC) on p-type silicon solar cell. But, two highly toxic gasses ammonia and silane are used. In the present study, the ARC and passivation properties of diamond-like nanocomposite (DLN) thin film on silicon solar cell have been investigated. The DLN thin film has been deposited by rf-PACVD process using liquid precursor HMDSO in argon plasma. The film has been characterized by FESEM, HRTEM, FTIR, and Raman spectroscopy. The optical properties have been estimated by UV-vis-NIR spectroscopy. The minimum reflection has been achieved to 0.75% at 630 nm. Both the short circuit current density and open circuit voltage has been increased significantly from 28.6 mA cm-2 to 35.5 mA cm-2 and 0.551 V to 0.613 V respectively. The field effect passivation has been confirmed by dark IV characterization of c-Si /DLN heterojunction structure. All these lead to enhancement of efficiency by almost 4% absolute, which is comparable to SiN x . The ammonia and silane free deposited DLN thin film has a great potential to use as ARC for silicon based solar cell.

Reflectance modeling of electrochemically P-type porosified silicon by Drude-Lorentz model

NASA Astrophysics Data System (ADS)

Kadi, M.; Media, E. M.; Gueddaoui, H.; Outemzabet, R.

2014-09-01

Porous silicon remains a promising material for optoelectronic application; in this field monitoring of the refractive index profile of the porous layer is required. We present in this work a procedure based on Drude-Lorentz model for calculating the optical parameters such as the high- and low-frequency dielectric constants, the plasma frequency by fitting the reflectance spectra. The experimental data of different porous silicon layer created above the bulk silicon material by electrochemical etching are extracted from reflectance measurements. The reflectance spectra are recorded in the spectral range 350-2500 nm. First, our computational procedure has been validated by its application on mono-crystalline silicon for the determination of its optical parameters. A good agreement between our results and those found in other works has been achieved in the visible-NIR range. In the second step, the model was applied to porous silicon (PS) layers. Useful optical parameters like the refractive index and the extinction coefficient, respectively, n (λ) and κ(λ), the band gap Eg, of different fabricated porous silicon layer are determined from simulated reflectance spectra. The correlation between the optical properties and the conditions of the electrochemical treatment was observed and analyzed. The main conclusion is that the reflected light from the porous silicon surface, although non-homogeneous and thus possessing the light scattering, is essentially smaller than the reflected light from the bulk crystalline silicon. These results show that the porous surface layer can act as an antireflection coating for silicon and could be used, in particular, in solar cells.

SkyMapper Filter Set: Design and Fabrication of Large-Scale Optical Filters

NASA Astrophysics Data System (ADS)

Bessell, Michael; Bloxham, Gabe; Schmidt, Brian; Keller, Stefan; Tisserand, Patrick; Francis, Paul

2011-07-01

The SkyMapper Southern Sky Survey will be conducted from Siding Spring Observatory with u, v, g, r, i, and z filters that comprise glued glass combination filters with dimensions of 309 × 309 × 15 mm. In this article we discuss the rationale for our bandpasses and physical characteristics of the filter set. The u, v, g, and z filters are entirely glass filters, which provide highly uniform bandpasses across the complete filter aperture. The i filter uses glass with a short-wave pass coating, and the r filter is a complete dielectric filter. We describe the process by which the filters were constructed, including the processes used to obtain uniform dielectric coatings and optimized narrowband antireflection coatings, as well as the technique of gluing the large glass pieces together after coating using UV transparent epoxy cement. The measured passbands, including extinction and CCD QE, are presented.

[beta]-silicon carbide protective coating and method for fabricating same

DOEpatents

Carey, P.G.; Thompson, J.B.

1994-11-01

A polycrystalline beta-silicon carbide film or coating and method for forming same on components, such as the top of solar cells, to act as an extremely hard protective surface, and as an anti-reflective coating are disclosed. This is achieved by DC magnetron co-sputtering of amorphous silicon and carbon to form a SiC thin film onto a surface, such as a solar cell. The thin film is then irradiated by a pulsed energy source, such as an excimer laser, to synthesize the poly- or [mu]c-SiC film on the surface and produce [beta]-SiC. While the method of this invention has primary application in solar cell manufacturing, it has application wherever there is a requirement for an extremely hard surface. 3 figs.

High-performance continuous-wave room temperature 4.0-μm quantum cascade lasers with single-facet optical emission exceeding 2 W

PubMed Central

Lyakh, A.; Maulini, R.; Tsekoun, A.; Go, R.; Von der Porten, S.; Pflügl, C.; Diehl, L.; Capasso, Federico; Patel, C. Kumar N.

2010-01-01

A strain-balanced, AlInAs/InGaAs/InP quantum cascade laser structure, designed for light emission at 4.0 μm using nonresonant extraction design approach, was grown by molecular beam epitaxy. Laser devices were processed in buried heterostructure geometry. An air-cooled laser system incorporating a 10-mm × 11.5-μm laser with antireflection-coated front facet and high-reflection-coated back facet delivered over 2 W of single-ended optical power in a collimated beam. Maximum continuous-wave room temperature wall plug efficiency of 5.0% was demonstrated for a high-reflection-coated 3.65-mm × 8.7-μm laser mounted on an aluminum nitride submount.

Optical properties of Na2O-TiO2-SiO2 glass films prepared by the sol-gel method

NASA Astrophysics Data System (ADS)

Barton, Ivo; Matejec, Vlastimil; Mrazek, Jan; Predoana, Luminita; Zaharescu, Maria

2017-12-01

Layers based on TiO2-SiO2 systems fabricated by sol-gel method have been investigated for the preparation of planar waveguides, antireflective coatings, Bragg mirrors, etc. However, at high titania contents such materials exhibit high viscosities and tendency to phase separation. In this paper we present optical properties of films containing TiO2 which are prepared via a novel approach sol-gel on the basis of ternary Na2O-TiO2-SiO2 glasses and which can exhibit lower viscosities. Films of Na2O-TiO2-SiO2 systems were prepared from input sols mixed of silica, titania and sodium oxide sols. The silica sol was prepared from tetraethyl orthosilicate (TEOS), ethanol, hydrochloric acid and water, with a TEOS c= 2 mol/l and water/alkoxide ratio 1.75. The titania sol was mixed from titanium tetraisopropoxide (TiPr), propan-2-ol, nitric acid and water, c= 0.5 mol/l, RW= 0.42. The sodium oxide sols with c= 0.474 mol/l were prepared from sodium ethoxide and ethanol. Input sols were prepared by mixing the silica and titania sols first and then the sodium sol was added. The input sols were aged for one hour. Stable input sols were obtained. The input sols were deposited on glass and silica slides by dip-coating technique at a withdrawing speeds of 200 mm/min. Applied gel layers were thermally treated at temperatures of 450 and 900°C. Layers containing sodium oxide and titania in concentration ranges of 0-20 mol.% and 0-30 mol.% respectively have been fabricated. Optical properties of layers were determined by UV-VIS-NIR transmission and reflection spectrophotometry. Refractive indices of layers were determined by spectral ellipsometry and from transmission spectra. Optical properties were correlated with results of XRD spectroscopy, optical microscopy, and atomic force microscopy. Transparent homogenous films with a maximum refractive index of 1.61 at a wavelength of 600 nm have been obtained.

Enhanced super-hydrophobic and switching behavior of ZnO nanostructured surfaces prepared by simple solution--immersion successive ionic layer adsorption and reaction process.

PubMed

Suresh Kumar, P; Sundaramurthy, J; Mangalaraj, D; Nataraj, D; Rajarathnam, D; Srinivasan, M P

2011-11-01

A simple and cost-effective successive ionic layer adsorption and reaction (SILAR) method was adopted to fabricate hydrophobic ZnO nanostructured surfaces on transparent indium-tin oxide (ITO), glass and polyethylene terephthalate (PET) substrates. ZnO films deposited on different substrates show hierarchical structures like spindle, flower and spherical shape with diameters ranging from 30 to 300 nm. The photo-induced switching behaviors of ZnO film surfaces between hydrophobic and hydrophilic states were examined by water contact angle and X-ray photoelectron spectroscopy (XPS) analysis. ZnO nanostructured films had contact angles of ~140° and 160°±2 on glass and PET substrates, respectively, exhibiting hydrophobic behavior without any surface modification or treatment. Upon exposure to ultraviolet (UV) illumination, the films showed hydrophilic behavior (contact angle: 15°±2), which upon low thermal stimuli revert back to its original hydrophobic nature. Such reversible and repeatable switching behaviors were observed upon cyclical exposure to ultraviolet radiation. These biomimetic ZnO surfaces exhibit good anti-reflective properties with lower reflectance of 9% for PET substrates. Thus, the present work is significant in terms of its potential application in switching devices, solar coatings and self-cleaning smart windows. Copyright © 2011 Elsevier Inc. All rights reserved.

Improved performance of low cost CuInS2 superstrate-type solar cells using Zinc assisted spray pyrolysis processing

NASA Astrophysics Data System (ADS)

Cheshme Khavar, Amir Hossein; Mahjoub, Ali Reza; Taghavinia, Nima

2017-12-01

Superstrate configuration CuInS2 (CIS) solar cells are fabricated using a spray pyrolysis method. We avoided selenization process, cyanide etching and CdS buffer layer, to keep the process ‘green’. CIS layers are formed by spray pyrolysis of an aqueous precursor ink containing metal chloride salts and thiourea at 350 °C. We investigated the effect of intentional Zn doping on structural, morphological and photovoltaic response of the fabricated CIS films by dissolving ZnCl2 in aqueous precursor solution. At a zinc doping level ranging between 0.25 and 1.00 mol%, Zn doping is found to improve the CIS crystal growth and surface morphology of CIS films. Compared with the performance of the non-doped CIS cell, the Zn-doped CIS solar cell displayed a remarkable efficiency enhancement of 58-97% and the maximum enhancement was obtained at a Zn content of 0.5 mol%. The device structure consists of    and show promising PCE of 4.29 % without any anti-reflection coating. Over the course of 300 d under ambient condition, the fabricated device showed only 1% loss in efficiency.

Development of high-efficiency solar cells on silicon web

NASA Technical Reports Server (NTRS)

Rohatgi, A.; Meier, D. L.; Campbell, R. B.; Seidensticker, R. G.; Rai-Choudhury, P.

1985-01-01

High-efficiency dendritic cells were discussed. The influence of twin planes and heat treatment on the location and effect of trace impurities was of particular interest. Proper heat treatment often increases efficiency by causing impurities to pile up at twin planes. Oxide passivation had a beneficial effect on efficiency. A very efficient antireflective (AR) coating of zinc selenide and magnesium fluoride was designed and fabricated. An aluminum back-surface reflector was also effective.

Enabling High Performance Instruments for Astronomy and Space Exploration and ALD

NASA Technical Reports Server (NTRS)

Greer, Frank; Lee, M. C.; Hoenk, M. E.; Jones, T. J.; Jacquot, B. C.; Dickie, M.; Monacos, S.; Nikzad, S.; Day, P.; Leduc, R.;

Delta Doping High Purity CCDs and CMOS for LSST

NASA Technical Reports Server (NTRS)

Blacksberg, Jordana; Nikzad, Shouleh; Hoenk, Michael; Elliott, S. Tom; Bebek, Chris; Holland, Steve; Kolbe, Bill

2006-01-01

A viewgraph presentation describing delta doping high purity CCD's and CMOS for LSST is shown. The topics include: 1) Overview of JPL s versatile back-surface process for CCDs and CMOS; 2) Application to SNAP and ORION missions; 3) Delta doping as a back-surface electrode for fully depleted LBNL CCDs; 4) Delta doping high purity CCDs for SNAP and ORION; 5) JPL CMP thinning process development; and 6) Antireflection coating process development.

Fabrication of Polymeric Antireflection Film Manufactured by Anodic Aluminum Oxide Template on Dye-Sensitized Solar Cells.

PubMed

Tsai, Jenn-Kai; Tu, Yu-Shin

2017-03-15

In this study, high energy conversion efficient dye-sensitized solar cells (DSSCs) were successfully fabricated by attaching a double anti-reflection (AR) layer, which is composed of a subwavelength moth-eye structured polymethyl methacrylate (PMMA) film and a polydimethylsiloxane (PDMS) film. An efficiency of up to 6.79% was achieved. The moth-eye structured PMMA film was fabricated by using an anodic aluminum oxide (AAO) template which is simple, low-cost and scalable. The nano-pattern of the AAO template was precisely reproduced onto the PMMA film. The photoanode was composed of Titanium dioxide (TiO₂) nanoparticles (NPs) with a diameter of 25 nm deposited on the fluorine-doped tin oxide (FTO) glass substrate and the sensitizer N3. The double AR layer was proved to effectively improve the short-circuit current density (JSC) and conversion efficiency from 14.77 to 15.79 mA/cm² and from 6.26% to 6.79%, respectively.

An antireflection transparent conductor with ultralow optical loss (<2 %) and electrical resistance (<6 Ω sq−1)

PubMed Central

Maniyara, Rinu Abraham; Mkhitaryan, Vahagn K.; Chen, Tong Lai; Ghosh, Dhriti Sundar; Pruneri, Valerio

2016-01-01

Transparent conductors are essential in many optoelectronic devices, such as displays, smart windows, light-emitting diodes and solar cells. Here we demonstrate a transparent conductor with optical loss of ∼1.6%, that is, even lower than that of single-layer graphene (2.3%), and transmission higher than 98% over the visible wavelength range. This was possible by an optimized antireflection design consisting in applying Al-doped ZnO and TiO2 layers with precise thicknesses to a highly conductive Ag ultrathin film. The proposed multilayer structure also possesses a low electrical resistance (5.75 Ω sq−1), a figure of merit four times larger than that of indium tin oxide, the most widely used transparent conductor today, and, contrary to it, is mechanically flexible and room temperature deposited. To assess the application potentials, transparent shielding of radiofrequency and microwave interference signals with ∼30 dB attenuation up to 18 GHz was achieved. PMID:27991517

An antireflection transparent conductor with ultralow optical loss (<2 %) and electrical resistance (<6 Ω sq-1).

PubMed

Maniyara, Rinu Abraham; Mkhitaryan, Vahagn K; Chen, Tong Lai; Ghosh, Dhriti Sundar; Pruneri, Valerio

2016-12-19

Transparent conductors are essential in many optoelectronic devices, such as displays, smart windows, light-emitting diodes and solar cells. Here we demonstrate a transparent conductor with optical loss of ∼1.6%, that is, even lower than that of single-layer graphene (2.3%), and transmission higher than 98% over the visible wavelength range. This was possible by an optimized antireflection design consisting in applying Al-doped ZnO and TiO 2 layers with precise thicknesses to a highly conductive Ag ultrathin film. The proposed multilayer structure also possesses a low electrical resistance (5.75 Ω sq -1 ), a figure of merit four times larger than that of indium tin oxide, the most widely used transparent conductor today, and, contrary to it, is mechanically flexible and room temperature deposited. To assess the application potentials, transparent shielding of radiofrequency and microwave interference signals with ∼30 dB attenuation up to 18 GHz was achieved.

Inertial Confinement Fusion Quarterly Report January-March 1999, Volume 9, Number 2

DOE Office of Scientific and Technical Information (OSTI.GOV)

Atherton, J.

1999-03-31

This quarterly report covers the following topics: (1) Properties of and Manufacturing Methods for NIF Laser Glasses (J. H. Campbell)--The NIF amplifiers require 3380 Nd-doped laser glass slabs; continuous glass melting methods will be used for the first time to manufacture these slabs. The properties of the laser glasses are summarized and the novel continuous melting method is described. (2) Diffractive Optics for the NIF (J. A. Britten)--We have fabricated demonstration diffractive optics according to the NIF baseline design at full scale, via wet-chemical etching of patterns into fused silica. We have examined the effects of dip-coated sol-gel antireflection coatingsmore » on the performance of these optics, and have concluded that diffractive optics should remain uncoated to minimize laser-induced damage to downstream optics and to maximize environmental stability. We have also demonstrated the feasibility of combining all diffractive structures required by NIF, which vary over orders of magnitude in lateral and vertical scales, onto a single surface. (3) Producing KDP and DKDP Crystals for the NIF Laser (A. K. Burnham)--Rapid-growth KDP has overcome most of the hurdles for production of boules for NIF switch crystals and doublers, but some improvements in process reliability at the tripler's 3{omega} damage threshold are needed. The ability to meet KDP finishing specifications has been demonstrated, and the equipment for efficient NIF production is being built. (4) Engineering High-Damage-Threshold NIF Polarizers and Mirrors (C. J. Stolz)--High-fluence polarizer and mirror coatings for the NIF can be realized by engineering the coating process and design once the laser interaction with coating defects is understood. (5) Improved Antireflection Coatings for the NIF (P. K. Whitman)--We summarize our progress in developing antireflection coatings and applications processes for the NIF laser optics. We describe new materials and coating treatments to minimize the sensitivity of these porous sol-gel coatings to environmental humidity and organic contamination. (6) Developing Optics Finishing Technologies for the National Ignition Facility (T. G. Parham)--Fabrication of the 7500 meter-class lenses and flats for the NIF required extension of finishing technologies to meet cost and schedule targets. Developments at LLNL and our industrial partners are described for improved shaping, grinding, polishing, figuring, and metrology of large optics. (7) Laser-Damage Testing and Modeling Methods for Predicting the Performance of Large-Area NIF Optics (M. R. Kozlowski)--Laser damage to high-quality laser optics is limited by localized, defect-initiated processes. The damage performance of such materials is better described by statistical distributions than by discrete damage thresholds. The prediction of the damage performance of a Beamlet focus lens, based on new statistics-based damage data measurement and analysis techniques, is demonstrated. (8) Development of the NIF Target Chamber First Wall and Beam Dumps (A. K. Burnham)--NIF target designs and target chamber ablations are listed by a 1-nm/shot contamination rate of the final optics debris shield, as determined by transmittance and damage lifetime. This constraint forces a self-cleaning louvre design for the first wall and unconverted-light beam dumps. Nickel-free stainless steel is the cheapest and most practical material.« less

Hybrid Energy Cell with Hierarchical Nano/Micro-Architectured Polymer Film to Harvest Mechanical, Solar, and Wind Energies Individually/Simultaneously.

PubMed

Dudem, Bhaskar; Ko, Yeong Hwan; Leem, Jung Woo; Lim, Joo Ho; Yu, Jae Su

2016-11-09

We report the creation of hybrid energy cells based on hierarchical nano/micro-architectured polydimethylsiloxane (HNMA-PDMS) films with multifunctionality to simultaneously harvest mechanical, solar, and wind energies. These films consist of nano/micro dual-scale architectures (i.e., nanonipples on inverted micropyramidal arrays) on the PDMS surface. The HNMA-PDMS is replicable by facile and cost-effective soft imprint lithography using a nanoporous anodic alumina oxide film formed on the micropyramidal-structured silicon substrate. The HNMA-PDMS film plays multifunctional roles as a triboelectric layer in nanogenerators and an antireflection layer for dye-sensitized solar cells (DSSCs), as well as a self-cleaning surface. This film is employed in triboelectric nanogenerator (TENG) devices, fabricated by laminating it on indium-tin oxide-coated polyethylene terephthalate (ITO/PET) as a bottom electrode. The large effective contact area that emerged from the densely packed hierarchical nano/micro-architectures of the PDMS film leads to the enhancement of TENG device performance. Moreover, the HNMA-PDMS/ITO/PET, with a high transmittance of >90%, also results in highly transparent TENG devices. By placing the HNMA-PDMS/ITO/PET, where the ITO/PET is coated with zinc oxide nanowires, as the top glass substrate of DSSCs, the device is able to add the functionality of TENG devices, thus creating a hybrid energy cell. The hybrid energy cell can successfully convert mechanical, solar, and wind energies into electricity, simultaneously or independently. To specify the device performance, the effects of external pushing frequency and load resistance on the output of TENG devices are also analyzed, including the photovoltaic performance of the hybrid energy cells.

Optical, dielectric and morphological studies of sol-gel derived nanocrystalline TiO2 films.

PubMed

Vishwas, M; Sharma, Sudhir Kumar; Narasimha Rao, K; Mohan, S; Gowda, K V Arjuna; Chakradhar, R P S

2009-10-15

Nanocrystalline TiO(2) films have been synthesized on glass and silicon substrates by sol-gel technique. The films have been characterized with optical reflectance/transmittance in the wavelength range 300-1000 nm and the optical constants (n, k) were estimated by using envelope technique as well as spectroscopic ellipsometry. Morphological studies have been carried out using atomic force microscope (AFM). Metal-Oxide-Silicon (MOS) capacitor was fabricated using conducting coating on TiO(2) film deposited on silicon. The C-V measurements show that the film annealed at 300 degrees C has a dielectric constant of 19.80. The high percentage of transmittance, low surface roughness and high dielectric constant suggests that it can be used as an efficient anti-reflection coating on silicon and other optical coating applications and also as a MOS capacitor.

Exploration of the horizontally staggered light guides for high concentration CPV applications.

PubMed

Selimoglu, Ozgur; Turan, Rasit

2012-08-13

The material and processing costs are still the major drawbacks of the c-Si based photovoltaic (PV) technology. The wafer cost comprises up to 35-40% of the total module cost. New approaches and system designs are needed in order to reduce the share of the wafer cost in photovoltaic energy systems. Here we explore the horizontally staggered light guide solar optics for use in Concentrated Photovoltaic (CPV) applications. This optical system comprises a lens array system coupled to a horizontal light guide which directs the incoming light beam to its edge. We have designed and simulated this system using a commercial ray tracing software (Zemax). The system is more compact, thinner and more robust compared to the conventional CPV systems. Concentration levels as high as 1000x can easily be reached when the system is properly designed. With such a high concentration level, a good acceptance angle of + -1 degree is still be conserved. The analysis of the system reveals that the total optical efficiency of the system could be as high as %94.4 without any anti-reflection (AR) coating. Optical losses can be reduced by just accommodating a single layer AR coating on the initial lens array leading to a %96.5 optical efficiency. Thermal behavior of high concentration linear concentrator is also discussed and compared with a conventional point focus CPV system.

Laser processing of solar cells with anti-reflective coating

DOEpatents

Harley, Gabriel; Smith, David D.; Dennis, Tim; Waldhauer, Ann; Kim, Taeseok; Cousins, Peter John

2016-02-16

Contact holes of solar cells are formed by laser ablation to accommodate various solar cell designs. Use of a laser to form the contact holes is facilitated by replacing films formed on the diffusion regions with a film that has substantially uniform thickness. Contact holes may be formed to deep diffusion regions to increase the laser ablation process margins. The laser configuration may be tailored to form contact holes through dielectric films of varying thicknesses.

High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-Damascene lithography process

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Sakaida, Yasushi; Shinjo, Tetsuya; Hashimoto, Keisuke; Nakajima, Yasuyuki

2008-03-01

The present paper describes a novel class of bottom antireflective coating (BARC) and gap fill materials using dextrin derivatives. The general trend of interconnect fabrication for such a high performance LSI is to apply cupper (Cu)/ low-dielectric-constant (low-k) interconnect to reduce RC delay. A via-first dual damascene process is one of the most promising processes to fabricate Cu/ low-k interconnect due to its wide miss-alignment margin. The sacrificial materials containing dextrin derivatives under resist for lithography were developed in via-first dual damascene process. The dextrin derivatives in this study was obtained by the esterification of the hydroxyl groups of dextrin resulting in improved solubility in the resist solvents such as propylene glycol monomethylether, propylene glycol monomethylether acetate, and ethyl lactate due to avoid the issue of defects that were caused by incompatability. The etch rate of our developed BARC and gap fill materials using dextrin derivatives was more than two times faster than one of the ArF resists evaluated in a CF4 gas condition using reactive ion etching. The improved etch performance was also verified by comparison with poly(hydroxystyrene), acrylate-type materials and latest low-k materials as a reference. In addition to superior etch performance, these materials showed good resist profiles and via filling performance without voids in via holes.

Simulation and analysis of the absorption enhancement in p-i-n InGaN/GaN solar cell using photonic crystal light trapping structures

NASA Astrophysics Data System (ADS)

Gupta, Nikhil Deep; Janyani, Vijay

2016-10-01

The structure of p-i-n InGaN/GaN based solar cell having a photonic crystal (PhC)-based light trapping structure (LTS) at the top assisted by the planar metallic (aluminum) back reflector (BR) is proposed. We propose two different designs for efficiency enhancement: in one we keep the PhC structure etching depth extending from the top antireflective coating (ARC) of indium tin oxide (ITO) up to the p-GaN layer (which is beneath the ITO and above the active layer), whereas in the other design, the PhC LTS etching depth has been extended up to the InxGa1-xN absorbing layer, starting from the top ITO layer. The theoretical optical simulation studies and optimization of the required parameters of the structure, which help to investigate and demonstrate the effectiveness of the LTS in the efficiency enhancement of the structure, are presented. The work also demonstrates the Lambertian light trapping limits for the practical indium concentrations in a InxGa1-xN active layer cell. The paper also presents the comparison between the proposed designs and compares their results with that of a planar reference cell. The studies are carried out for various indium concentrations. The results indicate considerable enhancement in the efficiency due to the PhC LTS, mainly because of better coupling, low reflectance, and diffraction capability of the proposed LTS, although it is still under the Lambertian limits. The performance evaluation of the proposed structure with respect to the angle of incident light has also been done, indicating improved performance. The parameters have been optimized and calculated by means of rigorous coupled wave analysis (RCWA) method.

High-responsivity vertical-illumination Si/Ge uni-traveling-carrier photodiodes based on silicon-on-insulator substrate.

PubMed

Li, Chong; Xue, ChunLai; Liu, Zhi; Cong, Hui; Cheng, Buwen; Hu, Zonghai; Guo, Xia; Liu, Wuming

2016-06-09

Si/Ge uni-traveling carrier photodiodes exhibit higher output current when space-charge effect is overcome and the thermal effects is suppressed. High current is beneficial for increasing the dynamic range of various microwave photonic systems and simplifying high-bit-rate digital receivers in many applications. From the point of view of packaging, detectors with vertical-illumination configuration can be easily handled by pick-and-place tools and are a popular choice for making photo-receiver modules. However, vertical-illumination Si/Ge uni-traveling carrier (UTC) devices suffer from inter-constraint between high speed and high responsivity. Here, we report a high responsivity vertical-illumination Si/Ge UTC photodiode based on a silicon-on-insulator substrate. When the transmission of the monolayer anti-reflection coating was maximum, the maximum absorption efficiency of the devices was 1.45 times greater than the silicon substrate owing to constructive interference. The Si/Ge UTC photodiode had a dominant responsivity at 1550 nm of 0.18 A/W, a 50% improvement even with a 25% thinner Ge absorption layer.

Composite Yb:YAG/SiC-prism thin disk laser.

PubMed

Newburgh, G A; Michael, A; Dubinskii, M

2010-08-02

We report the first demonstration of a Yb:YAG thin disk laser wherein the gain medium is intracavity face-cooled through bonding to an optical quality SiC prism. Due to the particular design of the composite bonded Yb:YAG/SiC-prism gain element, the laser beam impinges on all refractive index interfaces inside the laser cavity at Brewster's angles. The laser beam undergoes total internal reflection (TIR) at the bottom of the Yb(10%):YAG thin disk layer in a V-bounce cavity configuration. Through the use of TIR and Brewster's angles, no optical coatings, either anti-reflective (AR) or highly reflective (HR), are required inside the laser cavity. In this first demonstration, the 936.5-nm diode pumped laser performed with approximately 38% slope efficiency at 12 W of quasi-CW (Q-CW) output power at 1030 nm with a beam quality measured at M(2) = 1.5. This demonstration opens up a viable path toward novel thin disk laser designs with efficient double-sided room-temperature heatsinking via materials with the thermal conductivity of copper on both sides of the disk.

Process effects resulting from an increased BARC thickness

NASA Astrophysics Data System (ADS)

Eakin, Ronald J.; Detweiler, Shangting F.; Stagaman, Gregory J.; Tesauro, Mark R.; Spak, Mark A.; Dammel, Ralph R.

1997-07-01

Process improvements attributed to the use of bottom anti- reflective coatings (B.A.R.C.s) are well documented. As our experience with these materials improves, so does our understanding of additional optimization. Recent supplier experiments suggest an increase in the thickness of AZR BARLiTM (bottom anti-reflective layer i-line) solution to reduce photoresist swing curve ratios. Also, changes in thin film stack on common substrates can adversely affect the degree of photoresist reflective notching. It is therefore of extreme importance to determine optimum thickness(es) of a B.A.R.C. material to ensure maximum process potential. We document several process effects in the conversion of a SRAM test device (0.38 - 0.45 micrometers) from a 650 angstrom to a 2000 angstrom BARLiTM film thickness using conventional i-line photolithography. Critical dimension (CD) uniformity and depth of focus (DOF) are evaluated. Defect density between the two processes are compared before and after etch employing optical metrology and electrical test structures. Sensitivity of overlay as a function of BARLiTM film thickness is investigated as well.

Integrated three-dimensional photonic nanostructures for achieving near-unity solar absorption and superhydrophobicity

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kuang, Ping; Lin, Shawn-Yu, E-mail: sylin@rpi.edu; Hsieh, Mei-Li

2015-06-07

In this paper, we proposed and realized 3D photonic nanostructures consisting of ultra-thin graded index antireflective coatings (ARCs) and woodpile photonic crystals. The use of the integrated ARC and photonic crystal structure can achieve broadband, broad-angle near unity solar absorption. The amorphous silicon based photonic nanostructure experimentally shows an average absorption of ∼95% for λ = 400–620 nm over a wide angular acceptance of θ = 0°–60°. Theoretical studies show that a Gallium Arsenide (GaAs) based structure can achieve an average absorption of >95% for λ = 400–870 nm. Furthermore, the use of the slanted SiO{sub 2} nanorod ARC surface layer by glancing angle deposition exhibits Cassie-Baxter statemore » wetting, and superhydrophobic surface is obtained with highest water contact angle θ{sub CB} ∼ 153°. These properties are fundamentally important for achieving maximum solar absorption and surface self-cleaning in thin film solar cell applications.« less

High-responsivity vertical-illumination Si/Ge uni-traveling-carrier photodiodes based on silicon-on-insulator substrate

PubMed Central

Li, Chong; Xue, ChunLai; Liu, Zhi; Cong, Hui; Cheng, Buwen; Hu, Zonghai; Guo, Xia; Liu, Wuming

2016-01-01

Si/Ge uni-traveling carrier photodiodes exhibit higher output current when space-charge effect is overcome and the thermal effects is suppressed. High current is beneficial for increasing the dynamic range of various microwave photonic systems and simplifying high-bit-rate digital receivers in many applications. From the point of view of packaging, detectors with vertical-illumination configuration can be easily handled by pick-and-place tools and are a popular choice for making photo-receiver modules. However, vertical-illumination Si/Ge uni-traveling carrier (UTC) devices suffer from inter-constraint between high speed and high responsivity. Here, we report a high responsivity vertical-illumination Si/Ge UTC photodiode based on a silicon-on-insulator substrate. When the transmission of the monolayer anti-reflection coating was maximum, the maximum absorption efficiency of the devices was 1.45 times greater than the silicon substrate owing to constructive interference. The Si/Ge UTC photodiode had a dominant responsivity at 1550 nm of 0.18 A/W, a 50% improvement even with a 25% thinner Ge absorption layer. PMID:27279426

Arrangement, Dopant Source, And Method For Making Solar Cells

DOEpatents

Rohatgi, Ajeet; Krygowski, Thomas W.

1999-10-26

Disclosed is an arrangement, dopant source and method used in the fabrication of photocells that minimize handling of cell wafers and involve a single furnace step. First, dopant sources are created by depositing selected dopants onto both surfaces of source wafers. The concentration of dopant that is placed on the surface is relatively low so that the sources are starved sources. These sources are stacked with photocell wafers in alternating orientation in a furnace. Next, the temperature is raised and thermal diffusion takes place whereby the dopant leaves the source wafers and becomes diffused in a cell wafer creating the junctions necessary for photocells to operate. The concentration of dopant diffused into a single side of the cell wafer is proportional to the concentration placed on the respective dopant source facing the side of the cell wafer. Then, in the same thermal cycle, a layer of oxide is created by introducing oxygen into the furnace environment after sufficient diffusion has taken place. Finally, the cell wafers receive an anti-reflective coating and electrical contacts for the purpose of gathering electrical charge.

Processing technology for high efficiency silicon solar cells

NASA Technical Reports Server (NTRS)

Spitzer, M. B.; Keavney, C. J.

1985-01-01

Recent advances in silicon solar cell processing have led to attainment of conversion efficiency approaching 20%. The basic cell design is investigated and features of greatest importance to achievement of 20% efficiency are indicated. Experiments to separately optimize high efficiency design features in test structures are discussed. The integration of these features in a high efficiency cell is examined. Ion implantation has been used to achieve optimal concentrations of emitter dopant and junction depth. The optimization reflects the trade-off between high sheet conductivity, necessary for high fill factor, and heavy doping effects, which must be minimized for high open circuit voltage. A second important aspect of the design experiments is the development of a passivation process to minimize front surface recombination velocity. The manner in which a thin SiO2 layer may be used for this purpose is indicated without increasing reflection losses, if the antireflection coating is properly designed. Details are presented of processing intended to reduce recombination at the contact/Si interface. Data on cell performance (including CZ and ribbon) and analysis of loss mechanisms are also presented.

Sol-Gel Derived Active Material for Yb Thin-Disk Lasers

PubMed Central

Almeida, Rui M.; Ribeiro, Tiago

2017-01-01

A ytterbium doped active material for thin-disk laser was developed based on aluminosilicate and phosphosilicate glass matrices containing up to 30 mol% YbO1.5. Thick films and bulk samples were prepared by sol-gel processing. The structural nature of the base material was assessed by X-ray diffraction and Raman spectroscopy and the film morphology was evidenced by scanning electron microscopy. The photoluminescence (PL) properties of different compositions, including emission spectra and lifetimes, were also studied. Er3+ was used as an internal reference to compare the intensities of the Yb3+ PL peaks at ~ 1020 nm. The Yb3+ PL lifetimes were found to vary between 1.0 and 0.5 ms when the Yb concentration increased from 3 to 30 mol%. Based on a figure of merit, the best active material selected was the aluminosilicate glass composition 71 SiO2-14 AlO1.5-15 YbO1.5 (in mol%). An active disk, ~ 36 μm thick, consisting of a Bragg mirror, an aluminosilicate layer doped with 15 mol% Yb and an anti-reflective coating, was fabricated. PMID:28869488

Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

NASA Astrophysics Data System (ADS)

Kumar, Kitty; Lee, Kenneth K. C.; Nogami, Jun; Herman, Peter R.; Kherani, Nazir P.

2013-03-01

This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si) into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

A Module Experimental Process System Development Unit (MEPSDU)

NASA Technical Reports Server (NTRS)

1981-01-01

Design work for a photovoltaic module, fabricated using single crystal silicon dendritic web sheet material, resulted in the identification of surface treatment to the module glass superstrate which improved module efficiencies. A final solar module environmental test, a simulated hailstone impact test, was conducted on full size module superstrates to verify that the module's tempered glass superstrate can withstand specified hailstone impacts near the corners and edges of the module. Process sequence design work on the metallization process selective, liquid dopant investigation, dry processing, and antireflective/photoresist application technique tasks, and optimum thickness for Ti/Pd are discussed. A noncontact cleaning method for raw web cleaning was identified and antireflective and photoresist coatings for the dendritic webs were selected. The design of a cell string conveyor, an interconnect feed system, rolling ultrasonic spot bonding heat, and the identification of the optimal commercially available programmable control system are also discussed. An economic analysis to assess cost goals of the process sequence is also given.

Optical properties of the Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings

NASA Astrophysics Data System (ADS)

Marszałek, Konstanty; Winkowski, Paweł; Jaglarz, Janusz

2014-01-01

Investigations of bilayer and trilayer Al2O3/SiO2 and Al2O3/HfO2/SiO2 antireflective coatings are presented in this paper. The oxide films were deposited on a heated quartz glass by e-gun evaporation in a vacuum of 5 × 10-3 [Pa] in the presence of oxygen. Depositions were performed at three different temperatures of the substrates: 100 °C, 200 °C and 300 °C. The coatings were deposited onto optical quartz glass (Corning HPFS). The thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Deposition rate was equal to 0.6 nm/s for Al2O3, 0.6 nm - 0.8 nm/s for HfO2 and 0.6 nm/s for SiO2. Simulations leading to optimization of the thin film thickness and the experimental results of optical measurements, which were carried out during and after the deposition process, have been presented. The optical thickness values, obtained from the measurements performed during the deposition process were as follows: 78 nm/78 nm for Al2O3/SiO2 and 78 nm/156 nm/78 nm for Al2O3/HfO2/SiO2. The results were then checked by ellipsometric technique. Reflectance of the films depended on the substrate temperature during the deposition process. Starting from 240 nm to the beginning of visible region, the average reflectance of the trilayer system was below 1 % and for the bilayer, minima of the reflectance were equal to 1.6 %, 1.15 % and 0.8 % for deposition temperatures of 100 °C, 200 °C and 300 °C, respectively.

Large-Aperture Wide-Bandwidth Anti-Reflection-Coated Silicon Lenses for Millimeter Wavelengths

NASA Technical Reports Server (NTRS)

Datta, R.; Munson, C. D.; Niemack, M. D.; McMahon, J. J.; Britton, J.; Wollack, E. J.; Beall, J.; Devlin, M. J.; Fowler, J.; Gallardo, P.;

Effects of long term space environment exposure on optical substrates and coatings (S0050-2)

NASA Technical Reports Server (NTRS)

Harvey, Keith; Mustico, Arthur; Vallimont, John

1993-01-01

Eastman Kodak Company included twelve substrate and coating samples on the Long Duration Exposure Facility (LDEF) structure. There were three Fused Silica and three Ultra Low Expansion (ULE) uncoated glass samples, two ULE samples with a high reflectance silver coating, two Fused Silica samples with an antireflectance coating, and two Fused silica samples with a solar rejection coating. A set of duplicate control samples was also manufactured and stored in a controlled environment for comparison purposes. Kodak's samples were included as a subset of the Georgia Institute of Technology tray, which was located on row 5-E, tray S0050-2. This placed the samples on the trailing edge of the structure, which protected them from the effects of atomic oxygen bombardment. An evaluation of the flight samples for effects from the 5 year mission showed that a contaminant was deposited on the samples, a micrometeoroid impact occurred on one of the samples, and the radiation darkening which was expected for the glass did not occur. The results are listed in more detail.

The CVD ZrB2 as a selective solar absorber

NASA Astrophysics Data System (ADS)

Randich, E.; Allred, D. D.

Coatings of ZrB2 and TiB2 for photothermal solar absorber applications were prepared using chemical vapor deposition (CVD) techniques. Oxidation tests suggest a maximum temperature limit for air exposure of 600 K for TiB2 and 800 K for Z4B2. Both materials exhibit innate spectral selectivity with emittance at 375 K ranging from 0.06 to 0.09 and solar absorptance for ZrB2 ranging from 0.67 to 0.77 and solar absorptance for TiB2 ranging from 0.46 to 0.58. ZrB2 has better solar selectivity and more desirable oxidation behavior than TiB2. A 0.071 micrometer antireflection coating of Si3N4 deposited on the ZrB2 coating leads to an increase in absorptance from 0.77 to 0.93, while the emittance remains unchanged.

Beam Splitter For Welding-Torch Vision System

NASA Technical Reports Server (NTRS)

Gilbert, Jeffrey L.

1991-01-01

Compact welding torch equipped with along-the-torch vision system includes cubic beam splitter to direct preview light on weldment and to reflect light coming from welding scene for imaging. Beam splitter integral with torch; requires no external mounting brackets. Rugged and withstands vibrations and wide range of temperatures. Commercially available, reasonably priced, comes in variety of sizes and optical qualities with antireflection and interference-filter coatings on desired faces. Can provide 50 percent transmission and 50 percent reflection of incident light to exhibit minimal ghosting of image.

Process Research ON Semix Silicon Materials (PROSSM)

NASA Astrophysics Data System (ADS)

Wohlgemuth, J. H.; Warfield, D. B.

1982-02-01

A cost effective process sequence was identified, equipment was designed to implement a 6.6 MW per year automated production line, and a cost analysis projected a $0.56 per watt cell add-on cost for this line. Four process steps were developed for this program: glass beads back clean-up, hot spray antireflective coating, wave soldering of fronts, and ion milling for edging. While spray dopants were advertised as an off the shelf developed product, they were unreliable with shorter than advertised shelf life.

Development of Low-cost, High Energy-per-unit-area Solar Cell Modules

NASA Technical Reports Server (NTRS)

Jones, G. T.; Chitre, S.; Rhee, S. S.

1978-01-01

The development of two hexagonal solar cell process sequences, a laserscribing process technique for scribing hexagonal and modified hexagonal solar cells, a large through-put diffusion process, and two surface macrostructure processes suitable for large scale production is reported. Experimental analysis was made on automated spin-on anti-reflective coating equipment and high pressure wafer cleaning equipment. Six hexagonal solar cell modules were fabricated. Also covered is a detailed theoretical analysis on the optimum silicon utilization by modified hexagonal solar cells.

A low-cost photovoltaic cell process based on thick film techniques

NASA Technical Reports Server (NTRS)

Mardesich, N.; Pepe, A.; Bunyan, S.; Edwards, B.; Olson, C.

1980-01-01

The low-cost, easily automated processing for solar cell fabrication being developed at Spectrolab for the DOE LSA program is described. These processes include plasma-etching, spray-on diffusion sources and antireflective coating, thick film metallization, aluminum back contacts, laser scribing and ultrasonic soldering. The process sequence has been shown to produce solar cells having 15% conversion efficiency at AM1 which meet the cell fabrication budget required for the DOE 1986 cost goal of $0.70 per peak watt in 1980.

Antireflective coating for AgBr-TlI and AgBr-TlBr0.46I0.54 solid solution crystals

NASA Astrophysics Data System (ADS)

Korsakov, Alexandr; Salimgareev, Dmitrii; Lvov, Alexandr; Zhukova, Liya

2016-12-01

We researched the process of ultraviolet (UV) irradiation for the crystals of AgBr-TlI and AgBr-TlBr0.46I0.54 systems. It was found that on the surface of irradiated crystals, the film is formed and film grain size depends on exposure time and crystal composition. This film proved to gain the transmission by reducing the reflection from its surface within the 8.0-27.0 μm range.

Process Research ON Semix Silicon Materials (PROSSM)

NASA Technical Reports Server (NTRS)

Wohlgemuth, J. H.; Warfield, D. B.

1982-01-01

A cost effective process sequence was identified, equipment was designed to implement a 6.6 MW per year automated production line, and a cost analysis projected a $0.56 per watt cell add-on cost for this line. Four process steps were developed for this program: glass beads back clean-up, hot spray antireflective coating, wave soldering of fronts, and ion milling for edging. While spray dopants were advertised as an off the shelf developed product, they were unreliable with shorter than advertised shelf life.

Semiconductor Laser with a Self-Pumped Phase Conjugate External Cavity

DTIC Science & Technology

1992-10-01

laser light is considered planar. In actuality, the HLP 1400 laser diode used in this experiment has a gaussian profile. This approximation is frequently...return beam is in phase with either the light transmitted through or reflected off the rear facet of the diode laser. In Fig. 3.2, E, is the light ...In the first case an anti-reflection coated laser diode was used. It emitted a broadband spectrum without the feedback. The PCM just lowered the

Array Automated Assembly Task Low Cost Silicon Solar Array Project, Phase 2

NASA Technical Reports Server (NTRS)

Rhee, S. S.; Jones, G. T.; Allison, K. L.

1978-01-01

Progress in the development of solar cells and module process steps for low-cost solar arrays is reported. Specific topics covered include: (1) a system to automatically measure solar cell electrical performance parameters; (2) automation of wafer surface preparation, printing, and plating; (3) laser inspection of mechanical defects of solar cells; and (4) a silicon antireflection coating system. Two solar cell process steps, laser trimming and holing automation and spray-on dopant junction formation, are described.

Development of technique for AR coating and nickel and copper metallization of solar cells. FPS Project: Product development

NASA Technical Reports Server (NTRS)

Taylor, W.

1982-01-01

Printed nickel overplated with copper and applied on top of a predeposited silicon nitride antireflective coating system for metallizing solar cells was analyzed. The ESL D and E paste formulations, and the new formulations F, G, H, and D-1 were evaluated. The nickel thick films were tested after firing for stability in the cleaning and plating solutions used in the Vanguard-Pacific brush plating process. It was found that the films are very sensitive to the leaning and alkaline copper solutions. Less sensitivity was displayed to the neutral copper solution. Microscopic and SEM observations show segregation of frit at the silicon nitride thick film interface with loose frit residues after lifting off plated grid lines.

Next-generation all-silica coatings for UV applications

NASA Astrophysics Data System (ADS)

Melninkaitis, A.; Grinevičiūtė, L.; Abromavičius, G.; Mažulė, L.; Smalakys, L.; Pupka, E.; Š čiuka, M.; Buzelis, R.; Kičas, S.

2017-11-01

Band-gap and refractive index are known as fundamental properties determining intrinsic optical resistance of multilayer dielectric coatings. By considering this fact we propose novel approach to manufacturing of interference thin films, based on artificial nano-structures of modulated porosity embedded in high band-gap matrix. Next generation all-silica mirrors were prepared by GLancing Angle Deposition (GLAD) using electron beam evaporation. High reflectivity (HR) was achieved by tailoring the porosity of highly resistant silica material during the thin film deposition process. Furthermore, the proposed approach was also demonstrated to work well in case of anti-reflection (AR) coatings. Conventional HR HfO2 and SiO2 as well as AR Al2O3 and SiO2 multilayers produced by Ion Beam Sputtering (IBS) were used as reference coatings. Damage performance of experimental coatings was also analyzed. All-silica based GLAD approach resulted in significant improvement of intrinsic laser damage resistance properties if compared to conventional coatings. Besides laser damage testing, other characteristics of experimental coatings are analyzed and discussed - reflectance, surface roughness and optical scattering. We believe that reported concept can be expanded to virtually any design of thin film coatings thus opening a new way of next generation highly resistant thin films well suited for high power and UV laser applications.

High efficiency thin-film crystalline Si/Ge tandem solar cell.

PubMed

Sun, G; Chang, F; Soref, R A

2010-02-15

We propose and simulate a photovoltaic solar cell comprised of Si and Ge pn junctions in tandem. With an anti-reflection film at the front surface, we have shown that optimal solar cells favor a thin Si layer and a thick Ge layer with a thin tunnel hetero-diode placed in between. We predict efficiency ranging from 19% to 28% for AM1.5G solar irradiance concentrated from 1 approximately 1000 Suns for a cell with a total thickness approximately 100 microm.

Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks.

PubMed

Kim, Sechan; Choi, Gyuhyun; Chae, Heeyeop; Lee, Nae-Eung

2016-05-01

In order to study the effects of bias pulsing on the etching characteristics of a silicon dioxide (SiO2) layer using multi-level hard mask (MLHM) structures of ArF photoresist/bottom anti-reflected coating/SiO2/amorphous carbon layer (ACL)/SiO2, the effects of bias pulsing conditions on the etch characteristics of a SiO2 layer with an ACL mask pattern in C4F8/CH2F2/O2/Ar etch chemistries were investigated in a dual-frequency capacitively-coupled plasma (CCP) etcher. The effects of the pulse frequency, duty ratio, and pulse-bias power in the 2 MHz low-frequency (LF) power source were investigated in plasmas generated by a 27.12 MHz high-frequency (HF) power source. The etch rates of ACL and SiO2 decreased, but the etch selectivity of SiO2/ACL increased with decreasing duty ratio. When the ACL and SiO2 layers were etched with increasing pulse frequency, no significant change was observed in the etch rates and etch selectivity. With increasing LF pulse-bias power, the etch rate of ACL and SiO2 slightly increased, but the etch selectivity of SiO2/ACL decreased. Also, the precise control of the critical dimension (CD) values with decreasing duty ratio can be explained by the protection of sidewall etching of SiO2 by increased passivation. Pulse-biased etching was successfully applied to the patterning of the nano-scale line and space of SiO2 using an ACL pattern.

Instrument development of the CMB polarization POLARBEAR-2 experiment

NASA Astrophysics Data System (ADS)

Siritanasak, Praween; POLARBEAR Collaboration

2017-06-01

We present the status of the development of the Polarbear-2 (PB-2) and Simons Array experiments. PB-2 is a ground-based Cosmic Microwave Back- ground (CMB) polarization experiment located at the James Ax observatory in the Atacama desert of Northern Chile. The Simons Array will consist of three PB-2 receivers on three Huan Tran-style telescopes, each containing a multi-chroic detector array. The first new Simons Array receiver, Polarbear- 2A(PB-2A), will be deployed in 2017. The PB-2A focal plane consists of 1,897 lenslet-coupled, dual-polarization, sinuous-antenna-coupled pixels operating at 95 and 150 GHz, making a total of 7,588 polarization-sensitive transition edge sensor (TES) bolometers. In the order to cover both frequencies, we developed broadband two layer anti-reflection (AR) coating for 5.345 mm diameter lenslets using two types of epoxy: Stycast2850FT and Stycast1090. We developed a mass production AR coating methodology that can control the uniformity and shape to within 25 μm error from the designed value. The second (PB-2B) and third (PB-2C) receivers will employ similar technologies and will cover 95, 150, 220 and 280 GHz. The Simons Array will survey 80% of the sky with broad frequency coverage and high resolution, making it a powerful tool to constrain the tensor-to-scalar ratio through measurements of primordial B-modes and the sum of the neutrino masses through measurements of B-modes produced by gravitational lensing.

Black silicon: fabrication methods, properties and solar energy applications

DOE PAGES

Liu, Xiaogang; Coxon, Paul R.; Peters, Marius; ...

2014-08-04

Black silicon (BSi) represents a very active research area in renewable energy materials. The rise of BSi as a focus of study for its fundamental properties and potentially lucrative practical applications is shown by several recent results ranging from solar cells and light-emitting devices to antibacterial coatings and gas-sensors. Here in this article, the common BSi fabrication techniques are first reviewed, including electrochemical HF etching, stain etching, metal-assisted chemical etching, reactive ion etching, laser irradiation and the molten salt Fray-Farthing-Chen-Cambridge (FFC-Cambridge) process. The utilization of BSi as an anti-reflection coating in solar cells is then critically examined and appraised, basedmore » upon strategies towards higher efficiency renewable solar energy modules. Methods of incorporating BSi in advanced solar cell architectures and the production of ultra-thin and flexible BSi wafers are also surveyed. Particular attention is given to routes leading to passivated BSi surfaces, which are essential for improving the electrical properties of any devices incorporating BSi, with a special focus on atomic layer deposition of Al 2O 3. Finally, three potential research directions worth exploring for practical solar cell applications are highlighted, namely, encapsulation effects, the development of micro-nano dual-scale BSi, and the incorporation of BSi into thin solar cells. It is intended that this paper will serve as a useful introduction to this novel material and its properties, and provide a general overview of recent progress in research currently being undertaken for renewable energy applications.« less

Optical coatings on laser crystals for HiPER project

NASA Astrophysics Data System (ADS)

Oulehla, Jindrich; Pokorný, Pavel; Lazar, Josef

2011-12-01

In this contribution we present a technology for deposition of interference coatings for optical components designed to operate as active media in power pulsed lasers. The aim of the technology is to prepare crystals for lasers for the HiPER project (High Power laser Energy Research facility) which should demonstrate the feasibility of laser driven fusion as a future energy source. Diode pumped solid state lasers (DPSSL) are the most likely option for fusion ignition. The choice of the material for the lasers' active medium is critical. Some of the most important properties include the ability to be antireflection coated to reduce the energy losses and increase the overall efficiency. This contribution deals with some of the materials considered to be candidates for slabs serving as the active medium of the DPSSLs. We tested Yb:YAG and Yb:CaF2 samples. As large amounts of heat need to be dissipated during laser operation, cryogenic cooling is necessary. Appropriate coating materials and techniques need to be chosen. Therefore differences between available coating techniques are investigated in terms of adhesion, enduring of stress from temperature shocks, etc. Coated samples were placed into cryogenic environment in order to simulate conditions similar to those in real life operation. Optical microscopy was used for coating investigation after the conducted experiments.

AR coatings on laser crystals for HiPER project

NASA Astrophysics Data System (ADS)

Oulehla, Jindřich; Pokorný, Pavel

2010-08-01

In this contribution we present a technology for deposition of interference coatings for optical components designed to operate as active media in power pulsed lasers. The aim of the technology is to prepare crystals for lasers for the HiPER project (High Power laser Energy Research) which should demonstrate the feasibility of laser driven fusion as a future energy source. Diode pumped solid state lasers (DPSSL) are the most likely option for fusion ignition. The choice of material for the lasers active medium is critical. Some of the most important properties include the ability to be antireflection coated to reduce the energy losses and increase the overall efficiency. This contribution deals with some of the materials considered to be candidates for slabs serving as the active medium of the DPSSLs. We tested Yb:YAG, Yb:CaF2 samples. As large amounts of heat need to be dissipated during laser operation, cryogenic cooling is necessary. Appropriate coating materials and techniques need to be chosen. Therefore differences between available coating techniques are investigated in terms of adhesion, enduring of stress resulting from temperature shocks, etc. Coated samples were placed into cryogenic environment in order to simulate conditions similar to those in real life operation. Optical microscopy was used for coating investigation after the conducted experiments.

Controlled Thermal Expansion Coat for Thermal Barrier Coatings

NASA Technical Reports Server (NTRS)

Brindley, William J. (Inventor); Miller, Robert A. (Inventor); Aikin, Beverly J. M. (Inventor)

1999-01-01

A improved thermal barrier coating and method for producing and applying such is disclosed herein. The thermal barrier coating includes a high temperature substrate, a first bond coat layer applied to the substrate of MCrAlX, and a second bond coat layer of MCrAlX with particles of a particulate dispersed throughout the MCrAlX and the preferred particulate is Al2O3. The particles of the particulate dispersed throughout the second bond coat layer preferably have a diameter of less then the height of the peaks of the second bond coat layer, or a diameter of less than 5 microns. The method of producing the second bond coat layer may either include the steps of mechanical alloying of particles throughout the second bond coat layer, attrition milling the particles of the particulate throughout the second bond coat layer, or using electrophoresis to disperse the particles throughout the second bond coat layer. In the preferred embodiment of the invention, the first bond coat layer is applied to the substrate, and then the second bond coat layer is thermally sprayed onto the first bond coat layer. Further, in a preferred embodiment of die invention, a ceramic insulating layer covers the second bond coat layer.

Advanced Passivation Technology and Loss Factor Minimization for High Efficiency Solar Cells.

PubMed

Park, Cheolmin; Balaji, Nagarajan; Jung, Sungwook; Choi, Jaewoo; Ju, Minkyu; Lee, Seunghwan; Kim, Jungmo; Bong, Sungjae; Chung, Sungyoun; Lee, Youn-Jung; Yi, Junsin

2015-10-01

High-efficiency Si solar cells have attracted great attention from researchers, scientists, photovoltaic (PV) industry engineers for the past few decades. With thin wafers, surface passivation becomes necessary to increase the solar cells efficiency by overcoming several induced effects due to associated crystal defects and impurities of c-Si. This paper discusses suitable passivation schemes and optimization techniques to achieve high efficiency at low cost. SiNx film was optimized with higher transmittance and reduced recombination for using as an effective antireflection and passivation layer to attain higher solar cell efficiencies. The higher band gap increased the transmittance with reduced defect states that persisted at 1.68 and 1.80 eV in SiNx films. The thermal stability of SiN (Si-rich)/SiN (N-rich) stacks was also studied. Si-rich SiN with a refractive index of 2.7 was used as a passivation layer and N-rich SiN with a refractive index of 2.1 was used for thermal stability. An implied Voc of 720 mV with a stable lifetime of 1.5 ms was obtained for the stack layer after firing. Si-N and Si-H bonding concentration was analyzed by FTIR for the correlation of thermally stable passivation mechanism. The passivation property of spin coated Al2O3 films was also investigated. An effective surface recombination velocity of 55 cm/s with a high density of negative fixed charges (Qf) on the order of 9 x 10(11) cm(-2) was detected in Al2O3 films.

High brightness angled cavity quantum cascade lasers

DOE Office of Scientific and Technical Information (OSTI.GOV)

Heydari, D.; Bai, Y.; Bandyopadhyay, N.

2015-03-02

A quantum cascade laser (QCL) with an output power of 203 W is demonstrated in pulsed mode at 283 K with an angled cavity. The device has a ridge width of 300 μm, a cavity length of 5.8 mm, and a tilt angle of 12°. The back facet is high reflection coated, and the front facet is anti-reflection coated. The emitting wavelength is around 4.8 μm. In distinct contrast to a straight cavity broad area QCL, the lateral far field is single lobed with a divergence angle of only 3°. An ultrahigh brightness value of 156 MW cm{sup −2 }sr{sup −1} is obtained, which marks the brightestmore » QCL to date.« less

Method of Producing Controlled Thermal Expansion Coat for Thermal Barrier Coatings

NASA Technical Reports Server (NTRS)

Brindley, William J. (Inventor); Miller, Robert A. (Inventor); Aikin, Beverly J. M. (Inventor)

2000-01-01

An improved thermal barrier coating and method for producing and applying such is disclosed herein. The thermal barrier coatings includes a high temperature substrate, a first bond coat layer applied to the substrate of MCrAlX and a second bond coat layer of MCrAlX with particles of a particulate dispersed throughout the MCrAlX and the preferred particulate is Al2O3. The particles of the particulate dispersed throughout the second bond coat layer preferably have a diameter of less then the height of the peaks of the second bond coat layer or a diameter of less than 5 micron. The method of producing the second bond coat layer may either include the steps of mechanical alloying of particles throughout the second bond coat layer, attrition milling the particles of the particulate throughout the second bond coat layer, or using electrophoresis to disperse the particles throughout the second bond coat layer. In the preferred embodiment of the invention the first bond coat layer is applied to the substrate. and then the second bond coat layer is thermally sprayed onto the first bond coat layer. Further, in a preferred embodiment of the invention a ceramic insulating layer covers the second bond coat layer.

Article with buffer layer and method of making the same

DOE Office of Scientific and Technical Information (OSTI.GOV)

McCamy, James W.; Ma, Zhixun; Kabagambe, Benjamin

A method of forming a coating layer on a glass substrate in a glass manufacturing process includes: providing a first coating precursor material for a selected coating layer composition to at least one multislot coater to form a first coating region of the selected coating layer; and providing a second coating precursor material for the selected coating layer composition to the multislot coater to form a second coating region of the selected coating layer over the first region. The first coating precursor material is different than the second precursor coating material.

Effect of SiO2 coating in bolometric Ge light detectors for rare event searches

NASA Astrophysics Data System (ADS)

Beeman, J. W.; Gentils, A.; Giuliani, A.; Mancuso, M.; Pessina, G.; Plantevin, O.; Rusconi, C.

2013-05-01

In germanium-based light detectors for scintillating bolometers, a SiO2 anti-reflective coating is often applied on the side of the germanium wafer exposed to light with the aim to improve its light collection efficiency. In this paper, we report about a measurement, performed in the temperature range 25-35 mK, of the light-collection increase obtained thanks to this method, which resulted to be of the order of 20%. The procedure followed has been carefully selected in order to minimize systematic effects. The employed light sources have the same spectral features (peaking at ˜630 nm wavelength) that will characterize future neutrinoless double beta decay experiments on the isotope 82Se and based on ZnSe crystals, such as LUCIFER. The coupling between source and light detector reproduces the configuration used in scintillating bolometers. The present measurement clarifies the role of SiO2 coating and describes a method and a set-up that can be extended to the study of other types of coatings and luminescent materials.

Fabrication of p(+)-n junction GaAs solar cells by a novel method

NASA Technical Reports Server (NTRS)

Ghandhi, S. K.; Mathur, G.; Rode, H.; Borrego, J. M.

1984-01-01

A novel method for making p(+)-n diffused junction GaAs solar cells, with the formation of a diffusion source, an anti-reflective coating, and a protective cover glass in a single chemical-vapor deposition operation is discussed. Consideration is given to device fabrication and to solar-cell characteristics. The advantages of the technique are that the number of process steps is kept to an absolute minimum, the fabrication procedure is low-cost, and the GaAs surface is protected during the entire operation.