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Sample records for masked helium implantation

  1. Multi-part mask for implanting workpieces

    DOEpatents

    Webb, Aaron P.; Carlson, Charles T.

    2016-05-10

    A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.

  2. Blind binary masking for reverberation suppression in cochlear implants.

    PubMed

    Hazrati, Oldooz; Lee, Jaewook; Loizou, Philipos C

    2013-03-01

    A monaural binary time-frequency (T-F) masking technique is proposed for suppressing reverberation. The mask is estimated for each T-F unit by extracting a variance-based feature from the reverberant signal and comparing it against an adaptive threshold. Performance of the estimated binary mask is evaluated in three moderate to relatively high reverberant conditions (T60 = 0.3, 0.6, and 0.8 s) using intelligibility listening tests with cochlear implant users. Results indicate that the proposed T-F masking technique yields significant improvements in intelligibility of reverberant speech even in relatively high reverberant conditions (T60 = 0.8 s). The improvement is hypothesized to result from the recovery of the vowel/consonant boundaries, which are severely smeared in reverberation. PMID:23464030

  3. Simple method for decreasing wafer topography effect for implant mask

    NASA Astrophysics Data System (ADS)

    You, Taejun; Lee, Taehyeong; Yoo, Gyun; Park, Youngjoon; Kim, Cheolkyun; Yim, Donggyu

    2016-03-01

    Controlling critical dimension (CD) of implant blocking layers during photolithography has been challenging due to reflection caused by wafer topography. Unexpected reflection which comes from wafer topography makes severe CD variation on mask patterns of implant layer. Using bottom antireflective coatings(BARCs) can reduce the topography effect, but it could also damage wafer surface during BARCs dry etching. Developable BARCs(D-BARCs) could be alternative solution for wafer topography effect. However there are some issues that should be considered in D-BARCs process such as sensitive temperature control and managing defects. There are also papers introducing model based topography aware OPC as a solution for wafer topography effect implant layer. But building topography aware OPC model is very complex and it takes too much time to build. In this paper, we will introduce experimental results of wafer topography effect using various test patterns and propose a simple method that could effectively reduce wafer topography effect.

  4. Thermal desorption of helium from homogeneously implanted graphite

    NASA Astrophysics Data System (ADS)

    Jung, P.; Schroeder, H.

    1991-11-01

    Super-fine grain graphite (FGG) and pyrolytic carbon (PYC) of thicknesses around 200 μm were homogeneously implanted at room temperature with α-particles (0.5 MeV ≤ Eα ≤ 22 MeV). Thermal helium desorption spectrometry in the temperature range from 400 to 1900 K can be described by diffusion kinetics with an activation energy of 1.1 eV in FGG and about 0.75 eV in PYC. Desorption during temperature ramping at a constant rate of 0.83 K/s also shows significant differences of the two graphite species. It is found that in FGG and especially in PYC a considerable fraction of the implanted helium is retained even beyond 1000 K. This is in contrast to results reported after low energy implantations to high doses for various graphite species.

  5. Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications

    NASA Astrophysics Data System (ADS)

    Gonzalez, C. M.; Slingenbergh, W.; Timilsina, R.; Noh, J.-H.; Stanford, M. G.; Lewis, B. B.; Klein, K. L.; Liang, T.; Fowlkes, J. D.; Rack, P. D.

    2014-04-01

    One critical area for EUV lithography is the development of appropriate mask repair strategies. To this end, we have explored etching repair strategies for nickel absorber layers and focused electron beam induced deposition of ruthenium capping layers. Nickel has higher EUV absorption than the standard TaN absorber layer and thus thinner films and improved optical quality can be realized. A thin (2.5 nm) ruthenium film is commonly used as a protective capping layer on the Mo-Si EUV multi-layer mirror which mechanically and chemically protects the multi-layers during standard mask-making procedures. The gas field ion (GFIS) microscope was used to investigate helium and neon ion beam induced etching (IBIE) of nickel as a candidate technique for EUV lithography mask editing. No discernable nickel etching was observed for helium, however transmission electron microscopy (TEM) revealed subsurface damage to the underlying Mo-Si multilayers. Subsequently, neon beam induced etching at 30 keV was investigated and successfully removed the 50 nm nickel absorber film. TEM imaging also revealed subsurface damage in the underlying Mo-Si multilayer. Two damage regimes were apparent, namely: 1) beam induced mixing of the Mo-Si layers and 2) nanobubble formation. Monte Carlo simulations were performed and the observed damage regimes were correlated to: 1) the nuclear energy loss and 2) a critical implant concentration. Electron beam induced deposition (EBID) was explored to deposit ruthenium capping/protective layers. Several ruthenium precursors were screened and so far liquid bis(ethylcyclopentyldienyl)ruthenium(II) was successful. The purity of the as-deposited nanodeposits was estimated to be 10% Ru and 90% C. We demonstrate a new chemically assisted electron beam purification process to remove carbon by-products and show that high-fidelity nanoscale ruthenium repairs can be realized.

  6. Forward-masked spatial tuning curves in cochlear implant users

    PubMed Central

    Nelson, David A.; Donaldson, Gail S.; Kreft, Heather

    2008-01-01

    Forward-masked psychophysical spatial tuning curves (fmSTCs) were measured in twelve cochlear-implant subjects, six using bipolar stimulation (Nucleus devices)and six using monopolar stimulation (Clarion devices). fmSTCs were measured at several probe levels on a middle electrode using a fixed-level probe stimulus and variable-level maskers. The average fmSTC slopes obtained in subjects using bipolar stimulation (3.7 dB/mm) were approximately three times steeper than average slopes obtained in subjects using monopolar stimulation (1.2 dB/mm). Average spatial bandwidths were about half as wide for subjects with bipolar stimulation (2.6 mm) than for subjects with monopolar stimulation (4.6 mm). None of the tuning curve characteristics changed significantly with probe level. fmSTCs replotted in terms of acoustic frequency, using Greenwood’s [J. Acoust. Soc. Am. 33, 1344–1356 (1961)] frequency-to-place equation, were compared with forward-masked psychophysical tuning curves obtained previously from normal-hearing and hearing-impaired acoustic listeners. The average tuning characteristics of fmSTCs in electric hearing were similar to the broad tuning observed in normal-hearing and hearing-impaired acoustic listeners at high stimulus levels. This suggests that spatial tuning is not the primary factor limiting speech perception in many cochlear implant users. PMID:18345841

  7. Effect of helium implantation on SiC and graphite

    NASA Astrophysics Data System (ADS)

    Guo, Hong-Yan; Ge, Chang-Chun; Xia, Min; Guo, Li-Ping; Chen, Ji-Hong; Yan, Qing-Zhi

    2015-03-01

    Effects of helium implantation on silicon carbide (SiC) and graphite were studied to reveal the possibility of SiC replacing graphite as plasma facing materials. Pressureless sintered SiC and graphite SMF-800 were implanted with He+ ions of 20 keV and 100 keV at different temperatures and different fluences. The He+ irradiation induced microstructure changes were studied by field-emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and transmission electron microscopy (TEM). Project supported by the ITER-National Magnetic Confinement Fusion Program, China (Grant Nos. 2010GB109000, 2011GB108009, and 2014GB123000) and the National Natural Science Foundation of China (Grant No. 11075119).

  8. Effects of sequential tungsten and helium ion implantation on nano-indentation hardness of tungsten

    SciTech Connect

    Armstrong, D. E. J.; Edmondson, P. D.; Roberts, S. G.

    2013-06-24

    To simulate neutron and helium damage in a fusion reactor first wall sequential self-ion implantation up to 13 dpa followed by helium-ion implantation up to 3000 appm was performed to produce damaged layers of {approx}2 {mu}m depth in pure tungsten. The hardness of these layers was measured using nanoindentation and was studied using transmission electron microscopy. Substantial hardness increases were seen in helium implanted regions, with smaller hardness increases in regions which had already been self-ion implanted, thus, containing pre-existing dislocation loops. This suggests that, for the same helium content, helium trapped in distributed vacancies gives stronger hardening than helium trapped in vacancies condensed into dislocation loops.

  9. The role of helium implantation induced vacancy defect on hardening of tungsten

    SciTech Connect

    Ou, Xin; Anwand, Wolfgang Kögler, Reinhard; Zhou, Hong-Bo; Richter, Asta

    2014-03-28

    Vacancy-type defects created by helium implantation in tungsten and their impact on the nano-hardness characteristics were investigated by correlating the results from the positron annihilation spectroscopy and the nano-indentation technique. Helium implantation was performed at room temperature (RT) and at an elevated temperate of 600 °C. Also, the effect of post-annealing of the RT implanted sample was studied. The S parameter characterizing the open volume in the material was found to increase after helium irradiation and is significantly enhanced for the samples thermally treated at 600 °C either by irradiation at high temperature or by post-annealing. Two types of helium-vacancy defects were detected after helium irradiation; small defects with high helium-to-vacancy ratio (low S parameter) for RT irradiation and large defects with low helium-to-vacancy ratio (high S parameter) for thermally treated tungsten. The hardness of the heat treated tungsten coincides with the S parameter, and hence is controlled by the large helium-vacancy defects. The hardness of tungsten irradiated at RT without thermal treatment is dominated by manufacturing related defects such as dislocation loops and impurity clusters and additionally by trapped He atoms from irradiation effects, which enhance hardness. He-stabilized dislocation loops mainly cause the very high hardness values in RT irradiated samples without post-annealing.

  10. Structural investigations in helium implanted cubic zirconia using grazing incidence XRD and EXAFS spectroscopy

    NASA Astrophysics Data System (ADS)

    Kuri, G.; Degueldre, C.; Bertsch, J.; Döbeli, M.

    2010-06-01

    The crystal structure and local atom arrangements surrounding Zr atoms were determined for a helium implanted cubic stabilized zirconia (CSZ) using X-ray diffraction (XRD) and extended X-ray absorption fine structure (EXAFS) spectroscopy, respectively, measured at glancing angles. The implanted specimen was prepared at a helium fluence of 2 × 10 16 cm -2 using He + beams at two energies (2.54 and 2.74 MeV) passing through a 8.0 μm Al absorber foil. XRD results identified the formation of a new rhombohedral phase in the helium embedded layer, attributed to internal stress as a result of expansion of the CSZ-lattice. Zr K-edge EXAFS data suggested loss of crystallinity in the implanted lattice and disorder of the Zr atoms environment. EXAFS Fourier transforms analysis showed that the average first-shell radius of the Zr sbnd O pair in the implanted sample was slightly larger than that of the CSZ standard. Common general disorder features were explained by rhombohedral type short-range ordered clusters. The average structural parameters estimated from the EXAFS data of unimplanted and implanted CSZ are compared and discussed. Potential of EXAFS as a local probe of atomic-scale structural modifications induced by helium implantation in CSZ is demonstrated.

  11. Helium-Implantation-Induced Damage in NHS Steel Investigated by Slow-Positron Annihilation Spectroscopy

    NASA Astrophysics Data System (ADS)

    Li, Yuan-Fei; Shen, Tie-Long; Gao, Xing; Gao, Ning; Yao, Cun-Feng; Sun, Jian-Rong; Wei, Kong-Fang; Li, Bing-Sheng; Zhang, Peng; Cao, Xing-Zhong; Zhu, Ya-Bin; Pang, Li-Long; Cui, Ming-Huan; Chang, Hai-Long; Wang, Ji; Zhu, Hui-Ping; Wang, Dong; Song, Peng; Sheng, Yan-Bin; Zhang, Hong-Peng; Hu, Bi-Tao; Wang, Zhi-Guang

    2014-03-01

    Evolutions of defects and helium contained defects produced by atomic displacement and helium deposition with helium implantation at different temperatures in novel high silicon (NHS) steel are investigated by a slow positron beam. Differences of the defect information among samples implanted by helium to a fluence of 1 × 1017 ions/cm2 at room temperature, 300°C, 450°C and 750°C are discussed. It is found that the mobility of vacancies and vacancy clusters, a recombination of vacancy-type defects and the formation of the He-V complex lead to the occurrence of these differences. At high temperature irradiations, a change of the diffusion mechanism of He atoms/He bubbles might be one of the reasons for the change of the S-parameter.

  12. Impact of helium implantation and ion-induced damage on reflectivity of molybdenum mirrors

    NASA Astrophysics Data System (ADS)

    Garcia-Carrasco, A.; Petersson, P.; Hallén, A.; Grzonka, J.; Gilbert, M. R.; Fortuna-Zalesna, E.; Rubel, M.

    2016-09-01

    Molybdenum mirrors were irradiated with Mo and He ions to simulate the effect of neutron irradiation on diagnostic first mirrors in next-generation fusion devices. Up to 30 dpa were produced under molybdenum irradiation leading to a slight decrease of reflectivity in the near infrared range. After 3 × 1017 cm-2 of helium irradiation, reflectivity decreased by up to 20%. Combined irradiation by helium and molybdenum led to similar effects on reflectivity as irradiation with helium alone. Ion beam analysis showed that only 7% of the implanted helium was retained in the first 40 nm layer of the mirror. The structure of the near-surface layer after irradiation was studied with scanning transmission electron microscopy and the extent and size distribution of helium bubbles was documented. The consequences of ion-induced damage on the performance of diagnostic components are discussed.

  13. Binaural unmasking with multiple adjacent masking electrodes in bilateral cochlear implant users

    PubMed Central

    Lu, Thomas; Litovsky, Ruth; Zeng, Fan-Gang

    2011-01-01

    Bilateral cochlear implant (BiCI) users gain an advantage in noisy situations from a second implant, but their bilateral performance falls short of normal hearing listeners. Channel interactions due to overlapping electrical fields between electrodes can impair speech perception, but its role in limiting binaural hearing performance has not been well characterized. To address the issue, binaural masking level differences (BMLD) for a 125 Hz tone in narrowband noise were measured using a pair of pitch-matched electrodes while simultaneously presenting the same masking noise to adjacent electrodes, representing a more realistic stimulation condition compared to prior studies that used only a single electrode pair. For five subjects, BMLDs averaged 8.9 ± 1.0 dB (mean ± s.e.) in single electrode pairs but dropped to 2.1 ± 0.4 dB when presenting noise on adjacent masking electrodes, demonstrating a negative impact of the additional maskers. Removing the masking noise from only the pitch-matched electrode pair not only lowered thresholds but also resulted in smaller BMLDs. The degree of channel interaction estimated from auditory nerve evoked potentials in three subjects was significantly and negatively correlated with BMLD. The data suggest that if the amount of channel interactions can be reduced, BiCI users may experience some performance improvements related to binaural hearing. PMID:21682415

  14. The dependence of the high temperature mechanical properties of austenitic stainless steels on implanted helium

    NASA Astrophysics Data System (ADS)

    Schroeder, Herbert; Batfalsky, Peter

    1983-07-01

    High temperature helium embrittlement effects on the creep properties of AISI 316 SS (solution annealed + aged) and DIN 1.4970 SS (solution annealed + cold worked + aged) have been investigated. The generation of helium due to (n. α) nuclear reactions in a fusion reactor environment has been simulated by homogeneous helium implantation at a cyclotron. The creep rupture tests with various applied tensile stresses have been carried out at 1023 K. (316 SS) and 1079 K (1.4970 SS). respectively, with four differently treatly sets of samples: (1) unimplanted controls; (2) after room temperature implantation of 100 appm He; (3) after implantation of 100 appm He at test temperature; (4) creep tested at high temperature during implantation ("in-beam") with implantation rates of 10-100 appm He/b. In contrast to the ductile behaviour with transgranular failure of the unimplanted controls, all He-implanted samples showed brittle, intergranular early failure. The embrittlement effect was enhanced for the "in-beam" tested samples. The difference between the different treated sets of samples can be related to different bubble microstructures investigated by TEM. In addition, a comparison to reactor data for the DIN 1.4970 SS is presented.

  15. Low flux and low energy helium ion implantation into tungsten using a dedicated plasma source

    NASA Astrophysics Data System (ADS)

    Pentecoste, Lucile; Thomann, Anne-Lise; Melhem, Amer; Caillard, Amael; Cuynet, Stéphane; Lecas, Thomas; Brault, Pascal; Desgardin, Pierre; Barthe, Marie-France

    2016-09-01

    The aim of this work is to investigate the first stages of defect formation in tungsten (W) due to the accumulation of helium (He) atoms inside the crystal lattice. To reach the required implantation conditions, i.e. low He ion fluxes (1011-1014 ions.cm2.s-1) and kinetic energies below the W atom displacement threshold (about 500 eV for He+), an ICP source has been designed and connected to a diffusion chamber. Implantation conditions have been characterized by means of complementary diagnostics modified for measurements in this very low density helium plasma. It was shown that lowest ion fluxes could only be reached for the discharge working in capacitive mode either in α or γ regime. Special attention was paid to control the energy gained by the ions by acceleration through the sheath at the direct current biased substrate. At very low helium pressure, in α regime, a broad ion energy distribution function was evidenced, whereas a peak centered on the potential difference between the plasma and the biased substrate was found at higher pressures in the γ mode. Polycrystalline tungsten samples were exposed to the helium plasma in both regimes of the discharge and characterized by positron annihilation spectroscopy in order to detect the formed vacancy defects. It was found that W vacancies are able to be formed just by helium accumulation and that the same final implanted state is reached, whatever the operating mode of the capacitive discharge.

  16. Blistering and cracking of LiTaO3 single crystal under helium ion implantation

    NASA Astrophysics Data System (ADS)

    Ma, Changdong; Lu, Fei; Ma, Yujie

    2015-03-01

    Blistering and cracking in LiTaO3 surface are investigated after 200-keV helium ion implantation and subsequent post-implantation annealing. Rutherford backscattering/channeling is used to examine the lattice damage caused by ion implantation. Blistering is observed through optical microscopy in a dynamic heating process. Atomic force microscopy and scanning electron microscopy measurements are used to detect the LiTaO3 surface morphology. Experimental results show that blistering and flaking are dependent on implantation fluence, beam current, and also annealing temperature. We speculate that the surface cracking of He+-implanted LiTaO3 results from the implantation-induced stress and compression.

  17. Study of the amorphization of surface silicon layers implanted by low-energy helium ions

    NASA Astrophysics Data System (ADS)

    Lomov, A. A.; Myakon'kikh, A. V.; Oreshko, A. P.; Shemukhin, A. A.

    2016-03-01

    The structural changes in surface layers of Si(001) substrates subjected to plasma-immersion implantation by (2-5)-keV helium ions to a dose of D = 6 × 1015-5 × 1017 cm-2 have been studied by highresolution X-ray diffraction, Rutherford backscattering, and spectral ellipsometry. It is found that the joint application of these methods makes it possible to determine the density depth distribution ρ( z) in an implanted layer, its phase state, and elemental composition. Treatment of silicon substrates in helium plasma to doses of 6 × 1016 cm-2 leads to the formation of a 20- to 30-nm-thick amorphized surface layer with a density close to the silicon density. An increase in the helium dose causes the formation of an internal porous layer.

  18. Effects of helium implantation on the tensile properties and microstructure of Ni₇₃P₂₇ metallic glass nanostructures

    DOE PAGES

    Liontas, Rachel; Gu, X. Wendy; Fu, Engang; Wang, Yongqiang; Li, Nan; Mara, Nathan; Greer, Julia R.

    2014-09-10

    We report fabrication and nanomechanical tension experiments on as-fabricated and helium-implanted ~130 nm diameter Ni₇₃P₂₇ metallic glass nano-cylinders. The nano-cylinders were fabricated by a templated electroplating process and implanted with He⁺ at energies of 50, 100, 150, and 200 keV to create a uniform helium concentration of ~3 at. % throughout the nano-cylinders. Transmission electron microscopy (TEM) imaging and through-focus analysis reveal that the specimens contained ~2 nm helium bubbles distributed uniformly throughout the nano-cylinder volume. In-situ tensile experiments indicate that helium-implanted specimens exhibit enhanced ductility as evidenced by a 2-fold increase in plastic strain over as-fabricated specimens, with nomore » sacrifice in yield and ultimate tensile strengths. This improvement in mechanical properties suggests that metallic glasses may actually exhibit a favorable response to high levels of helium implantation.« less

  19. Effects of helium implantation on the tensile properties and microstructure of Ni₇₃P₂₇ metallic glass nanostructures

    SciTech Connect

    Liontas, Rachel; Gu, X. Wendy; Fu, Engang; Wang, Yongqiang; Li, Nan; Mara, Nathan; Greer, Julia R.

    2014-09-10

    We report fabrication and nanomechanical tension experiments on as-fabricated and helium-implanted ~130 nm diameter Ni₇₃P₂₇ metallic glass nano-cylinders. The nano-cylinders were fabricated by a templated electroplating process and implanted with He⁺ at energies of 50, 100, 150, and 200 keV to create a uniform helium concentration of ~3 at. % throughout the nano-cylinders. Transmission electron microscopy (TEM) imaging and through-focus analysis reveal that the specimens contained ~2 nm helium bubbles distributed uniformly throughout the nano-cylinder volume. In-situ tensile experiments indicate that helium-implanted specimens exhibit enhanced ductility as evidenced by a 2-fold increase in plastic strain over as-fabricated specimens, with no sacrifice in yield and ultimate tensile strengths. This improvement in mechanical properties suggests that metallic glasses may actually exhibit a favorable response to high levels of helium implantation.

  20. In situ creep under helium implantation of titanium aluminium alloy

    NASA Astrophysics Data System (ADS)

    Chen, J.; Jung, P.; Nazmy, M.; Hoffelner, W.

    2006-06-01

    The intermetallic alloy Ti-47Al-2W-0.5Si (at.%) has been homogeneously implanted with 4He2+ ions under uniaxial tensile stresses from 20 to 450 MPa to a maximum dose of about 0.16 dpa (1370 appm-He) with displacement damage rates of 2 × 10-6 dpa s-1 at temperatures of 573 and 773 K. Strain under implantation was determined by Linear Variable Displacement Transformer (LVDT), while changes of microstructure were investigated after implantation by Transmission Electron Microscopy (TEM). Irradiation creep strain showed a pronounced transient behaviour, virtually independent of temperature, with a stress dependence which can be approximately described by a creep compliance of 8 × 10-6 dpa-1 MPa-1 up to stresses of 350 MPa. The microstructure of the as-received material consisted of a patch-work of mainly lamellar γ/α2 colonies and equiaxed γ-grains with islands of precipitates. Only 'black dot' damage was observed after implantation at 573 K under different stresses, while implantation at 773 K yielded a dense population of bubbles and dislocation loops, mostly mutually attached.

  1. Irradiation creep and microstructural changes in an advanced ODS ferritic steel during helium implantation under stress

    NASA Astrophysics Data System (ADS)

    Chen, J.; Pouchon, M. A.; Kimura, A.; Jung, P.; Hoffelner, W.

    2009-04-01

    An advanced oxide dispersion strengthened (ODS) ferritic steel with very fine oxide particles has been homogeneously implanted with helium under uniaxial tensile stresses from 20 to 250 MPa to a maximum dose of about 0.38 dpa (1650 appm-He) with displacement damage rates of 4.4 × 10 -6 dpa/s at temperatures of 573 and 773 K. The samples were in the form of miniaturized dog-bones, where during the helium implantation the straining and the electrical resistance were monitored simultaneously. Creep compliances were measured to be 4.0 × 10 -6 and 11 × 10 -6 dpa -1 MPa -1 at 573 and 773 K, respectively. The resistivity of ODS steel samples decreased with dose, indicating segregation and/or precipitation. Evolution of microstructure during helium implantation was studied in detail by TEM. The effects of ODS particle size on irradiation creep and microstructural changes was investigated by comparing the results from the present advanced ODS (K1) to a commercial ODS ferritic steels (PM2000) with much bigger oxide particles.

  2. Simultaneous suppression of noise and reverberation in cochlear implants using a ratio masking strategy

    PubMed Central

    Hazrati, Oldooz; Omid Sadjadi, Seyed; Loizou, Philipos C.; Hansen, John H. L.

    2013-01-01

    Cochlear implant (CI) recipients' ability to identify words is reduced in noisy or reverberant environments. The speech identification task for CI users becomes even more challenging in conditions where both reverberation and noise co-exist as they mask the spectro-temporal cues of speech in a rather complementary fashion. Ideal channel selection (ICS) was found to result in significantly more intelligible speech when applied to the noisy, reverberant, as well as noisy reverberant speech. In this study, a blind single-channel ratio masking strategy is presented to simultaneously suppress the negative effects of reverberation and noise on speech identification performance for CI users. In this strategy, noise power spectrum is estimated from the non-speech segments of the utterance while reverberation spectral variance is computed as a delayed and scaled version of the reverberant speech spectrum. Based on the estimated noise and reverberation power spectra, a weight between 0 and 1 is assigned to each time-frequency unit to form the final mask. Listening experiments conducted with CI users in two reverberant conditions (T60 = 0.6 and 0.8 s) at a signal-to-noise ratio of 15 dB indicate substantial improvements in speech intelligibility in both reverberant-alone and noisy reverberant conditions considered. PMID:24180786

  3. Spatial Release From Masking in Simulated Cochlear Implant Users With and Without Access to Low-Frequency Acoustic Hearing

    PubMed Central

    Dietz, Mathias; Hohmann, Volker; Jürgens, Tim

    2015-01-01

    For normal-hearing listeners, speech intelligibility improves if speech and noise are spatially separated. While this spatial release from masking has already been quantified in normal-hearing listeners in many studies, it is less clear how spatial release from masking changes in cochlear implant listeners with and without access to low-frequency acoustic hearing. Spatial release from masking depends on differences in access to speech cues due to hearing status and hearing device. To investigate the influence of these factors on speech intelligibility, the present study measured speech reception thresholds in spatially separated speech and noise for 10 different listener types. A vocoder was used to simulate cochlear implant processing and low-frequency filtering was used to simulate residual low-frequency hearing. These forms of processing were combined to simulate cochlear implant listening, listening based on low-frequency residual hearing, and combinations thereof. Simulated cochlear implant users with additional low-frequency acoustic hearing showed better speech intelligibility in noise than simulated cochlear implant users without acoustic hearing and had access to more spatial speech cues (e.g., higher binaural squelch). Cochlear implant listener types showed higher spatial release from masking with bilateral access to low-frequency acoustic hearing than without. A binaural speech intelligibility model with normal binaural processing showed overall good agreement with measured speech reception thresholds, spatial release from masking, and spatial speech cues. This indicates that differences in speech cues available to listener types are sufficient to explain the changes of spatial release from masking across these simulated listener types. PMID:26721918

  4. Clinical evaluation of cochlear implant sound coding taking into account conjectural masking functions, MP3000™

    PubMed Central

    Buechner, Andreas; Beynon, Andy; Szyfter, Witold; Niemczyk, Kazimierz; Hoppe, Ulrich; Hey, Matthias; Brokx, Jan; Eyles, Julie; Van de Heyning, Paul; Paludetti, Gaetano; Zarowski, Andrzej; Quaranta, Nicola; Wesarg, Thomas; Festen, Joost; Olze, Heidi; Dhooge, Ingeborg; Müller-Deile, Joachim; Ramos, Angel; Roman, Stephane; Piron, Jean-Pierre; Cuda, Domenico; Burdo, Sandro; Grolman, Wilko; Vaillard, Samantha Roux; Huarte, Alicia; Frachet, Bruno; Morera, Constantine; Garcia-Ibáñez, Luis; Abels, Daniel; Walger, Martin; Müller-Mazotta, Jochen; Leone, Carlo Antonio; Meyer, Bernard; Dillier, Norbert; Steffens, Thomas; Gentine, André; Mazzoli, Manuela; Rypkema, Gerben; Killian, Matthijs; Smoorenburg, Guido

    2011-01-01

    Efficacy of the SPEAK and ACE coding strategies was compared with that of a new strategy, MP3000™, by 37 European implant centers including 221 subjects. The SPEAK and ACE strategies are based on selection of 8–10 spectral components with the highest levels, while MP3000 is based on the selection of only 4–6 components, with the highest levels relative to an estimate of the spread of masking. The pulse rate per component was fixed. No significant difference was found for the speech scores and for coding preference between the SPEAK/ACE and MP3000 strategies. Battery life was 24% longer for the MP3000 strategy. With MP3000 the best results were found for a selection of six components. In addition, the best results were found for a masking function with a low-frequency slope of 50 dB/Bark and a high-frequency slope of 37 dB/Bark (50/37) as compared to the other combinations examined of 40/30 and 20/15 dB/Bark. The best results found for the steepest slopes do not seem to agree with current estimates of the spread of masking in electrical stimulation. Future research might reveal if performance with respect to SPEAK/ACE can be enhanced by increasing the number of channels in MP3000 beyond 4–6 and it should shed more light on the optimum steepness of the slopes of the masking functions applied in MP3000. PMID:22251806

  5. Effect of 3.0 MeV helium implantation on electrical characteristics of 4H-SiC BJTs

    NASA Astrophysics Data System (ADS)

    Usman, Muhammad; Hallén, Anders; Ghandi, Reza; Domeij, Martin

    2010-11-01

    Degradation of 4H-SiC power bipolar junction transistors (BJTs) under the influence of a high-energy helium ion beam was studied. Epitaxially grown npn BJTs were implanted with 3.0 MeV helium in the fluence range of 1010-1011 cm-2. The devices were characterized by their current-voltage (I-V) behaviour before and after the implantation, and the results showed a clear degradation of the output characteristics of the devices. Annealing these implanted devices increased the interface traps between passivation oxide and the semiconductor, resulting in an increase of base current in the low-voltage operation range.

  6. Crystal orientation effects on implantation of low-energy hydrogen, helium and hydrogen/helium mixtures in plasma-facing tungsten surfaces

    NASA Astrophysics Data System (ADS)

    Linn, Brian C.

    The development of plasma-facing materials (PFM) is one of the major challenges in. realizing fusion reactors. Materials deployed in PFMs must be capable of withstanding the high-flux of low-energy hydrogen and helium ions omitted from the plasma. while not hindering the plasma. Tungsten is considered a promising candidate material due to desirable material properties including its high melting temperature, good thermal conductivity and relatively low physical and chemical sputtering yields. This thesis uses molecular dynamic simulations to investigate helium and hydrogen bombardment of tungsten and the underlying physical effects (e.g. sputtering, erosion, blistering). Non-cumulative and cumulative bombardment simulations of helium, hydrogen, and hydrogen/helium bombardment of tungsten were modeled using the molecular dynamics code LAMMPS. Two orientations of monocrystalline bcc tungsten surfaces were considered, (001) and (111). Simulations were performed for temperatures ranging from 600K up to 1500K and helium / hydrogen incident energies of 20eV to 100eV . The results of these simulations showed the effect of temperature and incident particle energy on retention rates and implantation/deposition profiles in tungsten.

  7. Microstructural observation of helium implanted and creep ruptured Fe 25%Ni 15%Cr alloys containing various MC and MN formers

    NASA Astrophysics Data System (ADS)

    Yamamoto, Norikazu; Nagakawa, Johsei; Murase, Yoshiharu; Shiraishi, Haruki

    1998-10-01

    Transmission electron microscopic observations have been carried out on Fe-25%Ni-15%Cr austenitic alloys with various MX (M=V, Ti, Nb, Zr; X=C, N) stabilizers after helium implantation and creep rupture at 923 K. It is shown that suppression of helium embrittlement can be achieved through a higher dispersion density of incoherent precipitates because of their high capability of bubble entrapment. A good agreement between the average distance of grain boundary bubbles exceeding the minimum critical size and the spacing of cavity traces on intergranularly fractured surfaces is obtained. This suggests that the enhancement of grain boundary decohesion by helium is a result of unstable growth of super-critical helium bubbles.

  8. Estimated solar wind-implanted helium-3 distribution on the Moon

    USGS Publications Warehouse

    Johnson, J. R.; Swindle, T.D.; Lucey, P.G.

    1999-01-01

    Among the solar wind-implanted volatiles present in the lunar regolith, 3 He is possibly the most valuable resource because of its potential as a fusion fuel. The abundance of 3 He in the lunar regolith at a given location depends on surface maturity, the amount of solar wind fluence, and titanium content, because ilmenite (FeTiO3) retains helium much better than other major lunar minerals. Surface maturity and TiO2 maps from Clementine multispectral data sets are combined here with a solar wind fluence model to produce a 3He abundance map of the Moon. Comparison of the predicted 3He values to landing site observations shows good correlation. The highest 3He abundances occur in the farside maria (due to greater solar wind fluence received) and in higher TiO2 nearside mare regions.

  9. Impurity gettering in silicon using cavities formed by helium implantation and annealing

    DOEpatents

    Myers, S.M. Jr.; Bishop, D.M.; Follstaedt, D.M.

    1998-11-24

    Impurity gettering in silicon wafers is achieved by a new process consisting of helium ion implantation followed by annealing. This treatment creates cavities whose internal surfaces are highly chemically reactive due to the presence of numerous silicon dangling bonds. For two representative transition-metal impurities, copper and nickel, the binding energies at cavities were demonstrated to be larger than the binding energies in precipitates of metal silicide, which constitutes the basis of most current impurity gettering. As a result the residual concentration of such impurities after cavity gettering is smaller by several orders of magnitude than after precipitation gettering. Additionally, cavity gettering is effective regardless of the starting impurity concentration in the wafer, whereas precipitation gettering ceases when the impurity concentration reaches a characteristic solubility determined by the equilibrium phase diagram of the silicon-metal system. The strong cavity gettering was shown to induce dissolution of metal-silicide particles from the opposite side of a wafer. 4 figs.

  10. Impurity gettering in silicon using cavities formed by helium implantation and annealing

    DOEpatents

    Myers, Jr., Samuel M.; Bishop, Dawn M.; Follstaedt, David M.

    1998-01-01

    Impurity gettering in silicon wafers is achieved by a new process consisting of helium ion implantation followed by annealing. This treatment creates cavities whose internal surfaces are highly chemically reactive due to the presence of numerous silicon dangling bonds. For two representative transition-metal impurities, copper and nickel, the binding energies at cavities were demonstrated to be larger than the binding energies in precipitates of metal silicide, which constitutes the basis of most current impurity gettering. As a result the residual concentration of such impurities after cavity gettering is smaller by several orders of magnitude than after precipitation gettering. Additionally, cavity gettering is effective regardless of the starting impurity concentration in the wafer, whereas precipitation gettering ceases when the impurity concentration reaches a characteristic solubility determined by the equilibrium phase diagram of the silicon-metal system. The strong cavity gettering was shown to induce dissolution of metal-silicide particles from the opposite side of a wafer.

  11. Temperature dependence of helium-implantation-induced lattice swelling in polycrystalline tungsten: X-ray micro-diffraction and Eigenstrain modelling

    SciTech Connect

    de Broglie, I.; Beck, C. E.; Liu, W.; Hofmann, Felix

    2015-05-30

    Using synchrotron X-ray micro-diffraction and Eigenstrain analysis the distribution of lattice swelling near grain boundaries in helium-implanted polycrystalline tungsten is quantified. Samples heat-treated at up to 1473 K after implantation show less uniform lattice swelling that varies significantly from grain to grain compared to as-implanted samples. An increase in lattice swelling is found in the vicinity of some grain boundaries, even at depths beyond the implanted layer. As a result, these findings are discussed in terms of the evolution of helium-ion-implantation-induced defects.

  12. Effect of simultaneous helium implantation on the microstructure evolution of Inconel X-750 superalloy during dual-beam irradiation

    NASA Astrophysics Data System (ADS)

    Changizian, P.; Zhang, H. K.; Yao, Z.

    2015-12-01

    This study focuses on investigation into the effect of helium implantation on microstructure evolution in Inconel X-750 superalloy during dual-beam (Ni+/He+) irradiation. The 1 MeV Ni+ ions with the damage rate of 10-3 dpa/s as well as 15 keV He+ ions using rate of 200 appm/dpa were simultaneously employed to irradiate specimens at 400 °C to different doses. Microstructure characterization has been conducted using high-resolution analytical transmission electron microscopy (TEM). The TEM results show that simultaneous helium injection has significant influence on irradiation-induced microstructural changes. The disordering of γ‧ (Ni3 (Al, Ti)) precipitates shows noticeable delay in dose level compared to mono heavy ion irradiation, which is attributed to the effect of helium on promoting the dynamic reordering process. In contrast to previous studies on single-beam ion irradiation, in which no cavities were reported even at high doses, very small (2-5 nm) cavities were detected after irradiation to 5 dpa, which proved that helium plays crucial role in cavity formation. TEM characterization also indicates that the helium implantation affects the development of dislocation loops during irradiation. Large 1/3 <1 1 1> Frank loops in the size of 10-20 nm developed during irradiation at 400 °C, whereas similar big loops detected at higher irradiation temperature (500 °C) during sole ion irradiation. This implies that the effect of helium on trapping the vacancies can help to develop the interstitial Frank loops at lower irradiation temperatures.

  13. Surface studies and implanted helium measurements following NOVA high-yield DT experiments

    SciTech Connect

    Stoyer, M.A.; Hudson, G.B.

    1997-02-18

    This paper presents the results of three March 6, 1996 direct-drive high-yield DT NOVA experiments and provides `proof-of-principal` results for the quantitative measurement of energetic He ions. Semiconductor quality Si wafers and an amorphous carbon wafer were exposed to NOVA high-yield implosions. Surface damage was sub-micron in general, although the surface ablation was slightly greater for the carbon wafer than for the Si wafers. Melting of a thin ({approx} 0.1{mu}) layer of Si was evident from microscopic investigation. Electron microscopy indicated melted blobs of many different metals (e.g. Al, Au, Ta, Fe alloys, Cu and even Cd) on the surfaces. The yield measured by determining the numbers of atoms of implanted {sup 4}He and {sup 3}He indicate the number of DT fusions to be 9.1({plus_minus}2.3) X 10{sup 12} and DD fusions to be 4.8({plus_minus}1.0) x 10{sup 10}, respectively. The helium DT fusion yield is slightly lower than that of the Cu activation measurement, which was 1.3({plus_minus}0.l) x 10{sup 13} DT fusions.

  14. The effect of masking noise on acoustic-phonetic contrasts in post-lingually deafened cochlear implant users

    NASA Astrophysics Data System (ADS)

    Vick, Jennell C.; Perkell, Joseph S.; Stockmann, Ellen; Zandipour, Majid; Lane, Harlan; Tiede, Mark

    2003-10-01

    This study examined the effect on the vowel contrast distance (average inter-vowel distance in the F1-F2 plane) of gradually decreasing the signal-to-noise ratio (SNR) in the auditory feedback of a post-lingually deafened cochlear implant (CI) user at 1-month and 1-year following CI processor activation. Masking noise, mixed with normal levels of speech feedback, was presented through the headpiece of a research sound processor to the CI user. As a control, an analogous procedure was used for a normal-hearing speaker where the masking noise and speech feedback were delivered over headphones. The SNR was gradually decreased over seven steps as the speakers produced ten repetitions of two vowel contrasts (æ\\/[g\\/] and i\\/u). Speech SPL and vowel contrast distance were measured at all seven masking noise levels. Data from both subjects showed that SPL gradually increased with decreased SNR, while contrast distance decreased. The effect was greater after 1 year of experience with a CI than at 1 month. The effect in the NH speaker was similar to that noted in the CI user after 1 year of experience. Data from additional subjects will be analyzed and reported. [Work supported by NIH Grant No. R01 DC03007.

  15. Fabrication of porous TiO2 nanorod array photoelectrodes with enhanced photoelectrochemical water splitting by helium ion implantation.

    PubMed

    Liu, Yichao; Shen, Shaohua; Ren, Feng; Chen, Jianan; Fu, Yanming; Zheng, Xudong; Cai, Guangxu; Xing, Zhuo; Wu, Hengyi; Jiang, Changzhong

    2016-05-19

    Porous photoelectrodes show high efficiency in hydrogen production by water splitting. However, fabrication of porous nanorods is usually difficult. Here, we report a simple approach to fabricate a kind of novel porous rutile titanium dioxide nanorod array by an advanced ion implantation method using multiple-energy helium ion implantation and subsequent annealing. The porous nanostructure enhances the photoelectrochemical performance of the titanium dioxide nanorod array photoelectrodes under Uv-visible light illumination, where the highest photocurrent density was relatively about 10 times higher than that of the pristine titanium dioxide nanorod array. The formation of nanocavities mainly contributes to the enhancement of the photocurrent density by trapping holes inside to separate the charge carriers. The study demonstrates that ion implantation could be an effective approach to develop novel porous nanostructural photoelectrodes for the application of hydrogen production.

  16. Characterization of UV6 photoresist stabiliztion and implant masking for exclusive implementation in 180-nm device processing

    NASA Astrophysics Data System (ADS)

    Lysaght, Patrick S.; Nguyen, Billy; Bersuker, Gennadi; Bennett, Joe; Hare, Tony; Doros, Theodore G.; Beach, James V.

    2000-06-01

    As design rules dip below 180 nm, DUV scanners are used at all critical levels with overlay requirements approaching 50 nm. Overlay specifications are typically 30% of critical dimension (CD), 45 nm maximum error for 150 nm geometries, but even non- critical layers at quarter micron may still require a 45 nm overlay for optimum device packing densities. The same photoresist (PR) material employed for patterning and etching thin film layers used to define device structures may also be used as an implant mask. Cost reduction efforts have prompted a detailed evaluation of the practical limits of exclusive utilization of UV6 PR for 180 nm CMOS device processing of 200 mm diameter wafers at SEMATECH. This paper addresses the characterization of UV6 PR relative to ion implant masking in order to discontinue i-line and eliminate mix-and-match lithography processing. Initially, wafers were prepared with incremental UV6 blanket thickness and processed through a range of ion implant operations prior to dry resist stripping by oxygen (02) plasma ashing. ThermaWaveTM optical surface roughness measurements were performed on the resultant bare silicon (Si) surface and compared with a non-implanted control sample for evidence of ion penetration and to determine the required PR mask thickness. Realization of conditions corresponding to the onset of elevated ThermaWaveTM Units (TW) established the parameters for a narrow range investigation of ion projection through UV6. Secondary Ion Mass Spectroscopy (SIMS) ion depth profiling was extensively utilized to specify the energy absorption efficiency of UV6 for each implant species; boron (11B), phosphorus (31P), and arsenic (75As). Residual Gas Analysis (RGA) measurements quantified the outgassing constituent elements detected during ion bombardment. This data assisted the effort to establish the optimum UV6 cure (stabilization/bake) process parameters necessary for particle free ashing. At SEMATECH, 11B, represents the most

  17. High-resolution, high-throughput, positive-tone patterning of poly(ethylene glycol) by helium beam exposure through stencil masks.

    PubMed

    Cacao, Eliedonna E; Nasrullah, Azeem; Sherlock, Tim; Kemper, Steven; Kourentzi, Katerina; Ruchhoeft, Paul; Stein, Gila E; Willson, Richard C

    2013-01-01

    In this work, a collimated helium beam was used to activate a thiol-poly(ethylene glycol) (SH-PEG) monolayer on gold to selectively capture proteins in the exposed regions. Protein patterns were formed at high throughput by exposing a stencil mask placed in proximity to the PEG-coated surface to a broad beam of helium particles, followed by incubation in a protein solution. Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR) spectra showed that SH-PEG molecules remain attached to gold after exposure to beam doses of 1.5-60 µC/cm(2) and incubation in PBS buffer for one hour, as evidenced by the presence of characteristic ether and methoxy peaks at 1120 cm(-1) and 2870 cm(-1), respectively. X-ray Photoelectron Spectroscopy (XPS) spectra showed that increasing beam doses destroy ether (C-O) bonds in PEG molecules as evidenced by the decrease in carbon C1s peak at 286.6 eV and increased alkyl (C-C) signal at 284.6 eV. XPS spectra also demonstrated protein capture on beam-exposed PEG regions through the appearance of a nitrogen N1s peak at 400 eV and carbon C1s peak at 288 eV binding energies, while the unexposed PEG areas remained protein-free. The characteristic activities of avidin and horseradish peroxidase were preserved after attachment on beam-exposed regions. Protein patterns created using a 35 µm mesh mask were visualized by localized formation of insoluble diformazan precipitates by alkaline phosphatase conversion of its substrate bromochloroindoyl phosphate-nitroblue tetrazolium (BCIP-NBT) and by avidin binding of biotinylated antibodies conjugated on 100 nm gold nanoparticles (AuNP). Patterns created using a mask with smaller 300 nm openings were detected by specific binding of 40 nm AuNP probes and by localized HRP-mediated deposition of silver nanoparticles. Corresponding BSA-passivated negative controls showed very few bound AuNP probes and little to no enzymatic formation of diformazan precipitates or silver nanoparticles

  18. The effect of MC and MN stabilizer additions on the creep rupture properties of helium implanted Fe-25% Ni-15% Cr austenitic alloy

    NASA Astrophysics Data System (ADS)

    Yamamoto, Norikazu; Nagakawa, Johsei; Shiraishi, Haruki

    1995-10-01

    Helium embrittlement resistance of Fe-25% Ni-15% Cr austenitic alloys with various MX (M = V, Ti, Nb, Zr; X = C, N) stabilizers was compared through post helium implantation creep testing at 923 K. While significant deterioration by helium in terms of creep rupture time and elongation occurred for all materials investigated, the suppression of the deterioration, especially in rupture time, was discerned for the materials in which semi-coherent MC (M = Ti, Ti + Nb, V + Ti) particles were distributed at high density. The material which contains the incoherent M 23C 6 as predominant precipitates seems to be less degraded by helium than those containing the MXs (M = Zr, V; X = C, N), if compared at the same number density of precipitates. Therefore, it is suggested that the high density dispersion of incoherent M 23C 6 as well as semi-coherent Ti containing MC particles would be beneficial in reducing the detrimental helium influences on mechanical properties.

  19. Effect of pre-implanted helium on void swelling evolution in self-ion irradiated HT9

    NASA Astrophysics Data System (ADS)

    Getto, E.; Jiao, Z.; Monterrosa, A. M.; Sun, K.; Was, G. S.

    2015-07-01

    Void evolution in Fe++-irradiated ferritic-martensitic alloy HT9 was characterized in the temperature range of 400-480 °C between doses of 25 and 375 displacements per atom (dpa) with pre-implanted helium levels of 0-100 appm. A systematic study using depth profiling in cross-section samples was conducted to determine a valid region of analysis between 300 and 700 nm from the surface, which excluded effects due to the injected interstitial and the surface. Pre-implanted helium was found to promote void swelling at low doses by shortening the nucleation regime and to retard void growth at doses in the transient regime by enhancement of nucleation of small voids. Swelling was found to peak at a temperature of 460 °C. The primary effect of temperature was on the nucleation regime; nucleation regime was the shortest at 460 °C compared to that at 440 and 480 °C. The growth rate of voids was temperature-invariant. Steady state swelling was reached at 460 °C between 188 and 375 dpa at a rate of 0.02%/dpa.

  20. Lattice modification in KTiOPO4 by hydrogen and helium sequentially implantation in submicrometer depth

    NASA Astrophysics Data System (ADS)

    Ma, Changdong; Lu, Fei; Xu, Bo; Fan, Ranran

    2016-05-01

    We investigated lattice modification and its physical mechanism in H and He co-implanted, z-cut potassium titanyl phosphate (KTiOPO4). The samples were implanted with 110 keV H and 190 keV He, both to a fluence of 4 × 1016 cm-2, at room temperature. Rutherford backscattering/channeling, high-resolution x-ray diffraction, and transmission electron microscopy were used to examine the implantation-induced structural changes and strain. Experimental and simulated x-ray diffraction results show that the strain in the implanted KTiOPO4 crystal is caused by interstitial atoms. The strain and stress are anisotropic and depend on the crystal's orientation. Transmission electron microscopy studies indicate that ion implantation produces many dislocations in the as-implanted samples. Annealing can induce ion aggregation to form nanobubbles, but plastic deformation and ion out-diffusion prevent the KTiOPO4 surface from blistering.

  1. Forward-Masked Frequency Selectivity Improvements in Simulated and Actual Cochlear Implant Users Using a Preprocessing Algorithm

    PubMed Central

    Jürgens, Tim

    2016-01-01

    Frequency selectivity can be quantified using masking paradigms, such as psychophysical tuning curves (PTCs). Normal-hearing (NH) listeners show sharp PTCs that are level- and frequency-dependent, whereas frequency selectivity is strongly reduced in cochlear implant (CI) users. This study aims at (a) assessing individual shapes of PTCs in CI users, (b) comparing these shapes to those of simulated CI listeners (NH listeners hearing through a CI simulation), and (c) increasing the sharpness of PTCs using a biologically inspired dynamic compression algorithm, BioAid, which has been shown to sharpen the PTC shape in hearing-impaired listeners. A three-alternative-forced-choice forward-masking technique was used to assess PTCs in 8 CI users (with their own speech processor) and 11 NH listeners (with and without listening through a vocoder to simulate electric hearing). CI users showed flat PTCs with large interindividual variability in shape, whereas simulated CI listeners had PTCs of the same average flatness, but more homogeneous shapes across listeners. The algorithm BioAid was used to process the stimuli before entering the CI users’ speech processor or the vocoder simulation. This algorithm was able to partially restore frequency selectivity in both groups, particularly in seven out of eight CI users, meaning significantly sharper PTCs than in the unprocessed condition. The results indicate that algorithms can improve the large-scale sharpness of frequency selectivity in some CI users. This finding may be useful for the design of sound coding strategies particularly for situations in which high frequency selectivity is desired, such as for music perception. PMID:27604785

  2. Forward-Masked Frequency Selectivity Improvements in Simulated and Actual Cochlear Implant Users Using a Preprocessing Algorithm.

    PubMed

    Langner, Florian; Jürgens, Tim

    2016-01-01

    Frequency selectivity can be quantified using masking paradigms, such as psychophysical tuning curves (PTCs). Normal-hearing (NH) listeners show sharp PTCs that are level- and frequency-dependent, whereas frequency selectivity is strongly reduced in cochlear implant (CI) users. This study aims at (a) assessing individual shapes of PTCs in CI users, (b) comparing these shapes to those of simulated CI listeners (NH listeners hearing through a CI simulation), and (c) increasing the sharpness of PTCs using a biologically inspired dynamic compression algorithm, BioAid, which has been shown to sharpen the PTC shape in hearing-impaired listeners. A three-alternative-forced-choice forward-masking technique was used to assess PTCs in 8 CI users (with their own speech processor) and 11 NH listeners (with and without listening through a vocoder to simulate electric hearing). CI users showed flat PTCs with large interindividual variability in shape, whereas simulated CI listeners had PTCs of the same average flatness, but more homogeneous shapes across listeners. The algorithm BioAid was used to process the stimuli before entering the CI users' speech processor or the vocoder simulation. This algorithm was able to partially restore frequency selectivity in both groups, particularly in seven out of eight CI users, meaning significantly sharper PTCs than in the unprocessed condition. The results indicate that algorithms can improve the large-scale sharpness of frequency selectivity in some CI users. This finding may be useful for the design of sound coding strategies particularly for situations in which high frequency selectivity is desired, such as for music perception. PMID:27604785

  3. Forward-Masked Frequency Selectivity Improvements in Simulated and Actual Cochlear Implant Users Using a Preprocessing Algorithm.

    PubMed

    Langner, Florian; Jürgens, Tim

    2016-09-07

    Frequency selectivity can be quantified using masking paradigms, such as psychophysical tuning curves (PTCs). Normal-hearing (NH) listeners show sharp PTCs that are level- and frequency-dependent, whereas frequency selectivity is strongly reduced in cochlear implant (CI) users. This study aims at (a) assessing individual shapes of PTCs in CI users, (b) comparing these shapes to those of simulated CI listeners (NH listeners hearing through a CI simulation), and (c) increasing the sharpness of PTCs using a biologically inspired dynamic compression algorithm, BioAid, which has been shown to sharpen the PTC shape in hearing-impaired listeners. A three-alternative-forced-choice forward-masking technique was used to assess PTCs in 8 CI users (with their own speech processor) and 11 NH listeners (with and without listening through a vocoder to simulate electric hearing). CI users showed flat PTCs with large interindividual variability in shape, whereas simulated CI listeners had PTCs of the same average flatness, but more homogeneous shapes across listeners. The algorithm BioAid was used to process the stimuli before entering the CI users' speech processor or the vocoder simulation. This algorithm was able to partially restore frequency selectivity in both groups, particularly in seven out of eight CI users, meaning significantly sharper PTCs than in the unprocessed condition. The results indicate that algorithms can improve the large-scale sharpness of frequency selectivity in some CI users. This finding may be useful for the design of sound coding strategies particularly for situations in which high frequency selectivity is desired, such as for music perception.

  4. Binaural release from masking with single- and multi-electrode stimulation in children with cochlear implants.

    PubMed

    Todd, Ann E; Goupell, Matthew J; Litovsky, Ruth Y

    2016-07-01

    Cochlear implants (CIs) provide children with access to speech information from a young age. Despite bilateral cochlear implantation becoming common, use of spatial cues in free field is smaller than in normal-hearing children. Clinically fit CIs are not synchronized across the ears; thus binaural experiments must utilize research processors that can control binaural cues with precision. Research to date has used single pairs of electrodes, which is insufficient for representing speech. Little is known about how children with bilateral CIs process binaural information with multi-electrode stimulation. Toward the goal of improving binaural unmasking of speech, this study evaluated binaural unmasking with multi- and single-electrode stimulation. Results showed that performance with multi-electrode stimulation was similar to the best performance with single-electrode stimulation. This was similar to the pattern of performance shown by normal-hearing adults when presented an acoustic CI simulation. Diotic and dichotic signal detection thresholds of the children with CIs were similar to those of normal-hearing children listening to a CI simulation. The magnitude of binaural unmasking was not related to whether the children with CIs had good interaural time difference sensitivity. Results support the potential for benefits from binaural hearing and speech unmasking in children with bilateral CIs. PMID:27475132

  5. Lattice swelling and modulus change in a helium-implanted tungsten alloy: X-ray micro-diffraction, surface acoustic wave measurements, and multiscale modelling

    SciTech Connect

    Hoffmann, F.; Nguyen-Manh, D.; Gilbert, M. R.; Beck, C. E.; Eliason, J. K.; Maznev, A. A.; Liu, W.; Armstrong, D. E.J.; Nelson, K. A.; Dudarev, S. L.

    2015-02-26

    Using X-ray micro-diffraction and surface acoustic wave spectroscopy, we measure lattice swelling and elastic modulus changes in aW-1% Re alloy after implantation with 3110 appm of helium. An observed lattice expansion of a fraction of a per cent gives rise to an order of magnitude larger reduction in the surface acoustic wave velocity. A multiscale model, combining elasticity and density functional theory, is applied to the interpretation of observations. The measured lattice swelling is consistent with the relaxation volume of self-interstitial and helium-filled vacancy defects that dominate the helium-implanted material microstructure. Larger scale atomistic simulations using an empirical potential confirm the findings of the elasticity and density functional theory model for swelling. The reduction of surface acoustic wave velocity predicted by density functional theory calculations agrees remarkably well with experimental observations.

  6. Simulation of nanostructure evolution under helium implantation in Fe-(2.5-12.5)at% Cr alloys at a temperature of 343 K

    NASA Astrophysics Data System (ADS)

    Gokhman, Aleksandr; Pecko, Stanislav; Slugeň, Vladimír

    2015-09-01

    Characterization of helium-implanted Fe-(2.5-12.5)at% Cr alloys with the flux of 7 × 10-6 dpa/s at a temperature of 343 K has been performed by means of cluster dynamics simulations. We have suggested a model for simulating an Fe-C-Cr system under helium implantation based on a selection of the latest data from atomistic studies and available experiments. Kinetics of carbon-vacancy and helium-vacancy complexes has been studied. Only one parameter is used to guarantee the best reproduction possible of experimental positron annihilation lifetime spectroscopy data for Fe-Cr alloys on dependences of vacancy cluster size on chromium content and irradiation dose via fitting. This is an effective binding energy of self-interstitial atoms to dislocation loops decorated by chromium atoms. It has a "snaky" dependence of chromium content with a minimum of about 9%Cr.

  7. Stud male-induced protection of implantation in food-deprived mice: masking effect of an artificial scent on pheromonal odour.

    PubMed

    Archunan, G; Dominic, C J

    1990-04-01

    In contrast to unscented stud males, stud males anointed with a commercial perfume failed to protect implantation in food-deprived females. It is suggested that the failure of perfumed stud males to protect pregnancy in their coital partners is due to the masking effect of the perfume on the stud male-originating olfactory cue which stimulates luteotrophic activity in females. The results are also consistent with the view that the newly inseminated female mouse identifies the stud male as an individual through a pheromonal cue and this is involved in the protective effect on implantation in the food-deprived female.

  8. Far-infrared transmittance of boron-implanted germanium at liquid-helium temperatures

    NASA Technical Reports Server (NTRS)

    Hadek, V.; Watson, D. M.; Beichman, C. A.; Jack, M. D.

    1985-01-01

    The transmission of far-infrared radiation of 100-microns-wavelength through Ge wafers ion implanted with B was measured at a temperature of approximately 4 K. Transmittance ranged from approximately 0.5 to 0.08 for doses from 3 x 10 to the 12th to 3 x 10 to the 15th/sq cm. The resistivity at temperatures between 4 and 1 K, and the impurity profiles of the implanted layers were also measured and correlated with the infrared transmittance.

  9. Gettering of transition metals by cavities in silicon formed by helium ion implantation

    SciTech Connect

    Petersen, G.A.; Myers, S.M.; Follstaedt, D.M.

    1996-09-01

    We have recently completed studies which quantitatively characterize the ability of nanometer-size cavities formed by He ion implantation to getter detrimental metal impurities in Si. Cavity microstructures formed in Si by ion implantation of He and subsequent annealing have been found to capture metal impurities by two mechanisms: (1) chemisorption on internal walls at low concentrations and (2) silicide precipitation at concentrations exceeding the solid solubility. Experiments utilizing ion-beam analysis, cross-sectional transmission electron microscopy, and secondary ion mass spectrometry were performed to quantitatively characterize the gettering effects and to determine the free energies associated with the chemisorbed metal atoms as a function of temperature. Mathematical models utilizing these results have been developed to predict gettering behavior.

  10. Helium plasma implantation on metals: Nanostructure formation and visible-light photocatalytic response

    SciTech Connect

    Kajita, Shin; Yoshida, Tomoko; Kitaoka, Daiki; Etoh, Reo; Yajima, Miyuki; Ohno, Noriyasu; Yoshida, Hisao; Yoshida, Naoaki; Terao, Yoshitaka

    2013-04-07

    It has been found recently that low-energy helium (He) plasma irradiation to tungsten (W) leads to the growth of W nanostructures on the surface. The process to grow the nanostructure is identified as a self-growth process of He bubbles and has a potential to open up a new plasma processing method. Here, we show that the metallic nanostructure formation process by the exposure to He plasma can occur in various metals such as, titanium, nickel, iron, and so on. When the irradiation conditions alter, the metallic cone arrays including nanobubbles inside are formed on the surface. Different from W cases, other processes than growth of fiberform structure, i.e., physical sputtering and the growth of large He bubbles, can be dominant on other metals during irradiation; various surface morphology changes can occur. The nanostructured W, part of which was oxidized, has revealed a significant photocatalytic activity under visible light (wavelength >700 nm) in decolorization of methylene blue without any co-catalyst.

  11. Two-wavelength Raman study of poly(ethylene terephthalate) surfaces modified by helium plasma-based ion implantation

    NASA Astrophysics Data System (ADS)

    Veres, M.; Tóth, A.; Mohai, M.; Bertóti, I.; Szépvölgyi, J.; Tóth, S.; Himics, L.; Koós, M.

    2012-12-01

    The surface of poly(ethylene terephthalate) (PET) was modified by helium plasma-based ion implantation (He PBII). The untreated and surface modified samples were characterised with optical absorption spectroscopy and two-wavelength micro-Raman spectroscopy excited with 488 nm and 785 nm light sources, allowing to examine the chemical bonding configuration of the surface layers on different depths and by selective enhancement of vibrations of different structural units. Upon treatment, simultaneously with the development of the broad D and G bands, a gradual decrease of the peaks corresponding to the Cdbnd C stretching and Cdbnd O stretching modes were observed with both excitations. Downshifting and broadening were detected for the Cdbnd C peak with both excitations and also for the Cdbnd O peak with the 488 nm excitation due to formation of condensed aromatic rings. Oppositely, upshifting was found with 785 nm excitation for the Cdbnd O peak and especially for its broad shoulder newly developed at the high wavenumber side. The latter feature was assigned to Cdbnd O groups attached to polymer chains without conjugation and the bands behaviour was interpreted by breaking of the Cdbnd C bonds of the polymer, leading to the formation of a crosslinked, disordered and stressed structure with still intact Cdbnd O groups, due to the increased nuclear damage at the end of the ion track.

  12. Formation and retention of surface pores in helium-implanted nano-grain tungsten for fusion reactor first-wall materials and divertor plates

    NASA Astrophysics Data System (ADS)

    Zenobia, S. J.; Kulcinski, G. L.

    2009-12-01

    Nano-grain W samples were implanted with 30 keV 3He ions to fluences of 1021, 1022 and 1023 He m-2, at temperatures ranging from approximately 1273 to 1423 K. One specimen was implanted with 30 keV 4He ions at 1273 K to 1024 He m-2. Scanning electron microscopy showed the onset of visible surface pore formation occurred between approximately 1021 and 1022 He+ m-2 and increased with higher implant fluences, eventually resulting in a 'coral-like' surface structure. Focused ion beam analysis revealed the depth of visible subsurface pores increased with higher doses, extending below the surface to a maximum value of approximately 730 nm. Using 3He(d, p)4He nuclear reaction analysis on 3He+ implanted specimens retained helium fluences were found to range from 4.0×1020 to 4.5×1021 He m-2. Each specimen sustained mass loss after implantation which was observed to increase with greater He+ dose.

  13. Effects of source-to-listener distance and masking on perception of cochlear implant processed speech in reverberant rooms

    PubMed Central

    Whitmal, Nathaniel A.; Poissant, Sarah F.

    2009-01-01

    Two experiments examined the effects of source-to-listener distance (SLD) on sentence recognition in simulations of cochlear implant usage in noisy, reverberant rooms. Experiment 1 tested sentence recognition for three locations in the reverberant field of a small classroom (volume=79.2 m3). Subjects listened to sentences mixed with speech-spectrum noise that were processed with simulated reverberation followed by either vocoding (6, 12, or 24 spectral channels) or no further processing. Results indicated that changes in SLD within a small room produced only minor changes in recognition performance, a finding likely related to the listener remaining in the reverberant field. Experiment 2 tested sentence recognition for a simulated six-channel implant in a larger classroom (volume=175.9 m3) with varying levels of reverberation that could place the three listening locations in either the direct or reverberant field of the room. Results indicated that reducing SLD did improve performance, particularly when direct sound dominated the signal, but did not completely eliminate the effects of reverberation. Scores for both experiments were predicted accurately from speech transmission index values that modeled the effects of SLD, reverberation, and noise in terms of their effects on modulations of the speech envelope. Such models may prove to be a useful predictive tool for evaluating the quality of listening environments for cochlear implant users. PMID:19894835

  14. [Masked depression].

    PubMed

    Preradović, M; Griva, D; Eror, S

    1991-01-01

    The study comprised 25 patients with masked depression and 30 patients with endogenous depression. According to the general characteristics both groups were homogenous and accordingly, comparable. Together with clinical evaluation of depressive syndrome, psychological management was applied. Rorschach test, Thematic Apperception Test and Minnesota Multiphasic Personality Inventory were used in the study. In the clinical picture of masked depressions somatovegetative disorders dominated and depressive behavior in endogenous depression. The frequence of suicid does not differ between patients with masked and endogenous depression.

  15. Some Considerations in Evaluating Spoken Word Recognition by Normal-Hearing, Noise-Masked Normal-Hearing, and Cochlear Implant Listeners. I: The Effects of Response Format

    PubMed Central

    Sommers, Mitchell S.; Kirk, Karen Iler; Pisoni, David B.

    2012-01-01

    Objective The purpose of the present studies was to assess the validity of using closed-set response formats to measure two cognitive processes essential for recognizing spoken words—perceptual normalization (the ability to accommodate acoustic-phonetic variability) and lexical discrimination (the ability to isolate words in the mental lexicon). In addition, the experiments were designed to examine the effects of response format on evaluation of these two abilities in normal-hearing (NH), noise-masked normal-hearing (NMNH), and cochlear implant (CI) subject populations. Design The speech recognition performance of NH, NMNH, and CI listeners was measured using both open- and closed-set response formats under a number of experimental conditions. To assess talker normalization abilities, identification scores for words produced by a single talker were compared with recognition performance for items produced by multiple talkers. To examine lexical discrimination, performance for words that are phonetically similar to many other words (hard words) was compared with scores for items with few phonetically similar competitors (easy words). Results Open-set word identification for all subjects was significantly poorer when stimuli were produced in lists with multiple talkers compared with conditions in which all of the words were spoken by a single talker. Open-set word recognition also was better for lexically easy compared with lexically hard words. Closed-set tests, in contrast, failed to reveal the effects of either talker variability or lexical difficulty even when the response alternatives provided were systematically selected to maximize confusability with target items. Conclusions These findings suggest that, although closed-set tests may provide important information for clinical assessment of speech perception, they may not adequately evaluate a number of cognitive processes that are necessary for recognizing spoken words. The parallel results obtained across

  16. Quantitation of maxillary remodeling. 2. Masking of remodeling effects when an "anatomical" method of superimposition is used in the absence of metallic implants.

    PubMed

    Baumrind, S; Korn, E L; Ben-Bassat, Y; West, E E

    1987-06-01

    We report the results of a study aimed at quantifying the differences in the perceived pattern of maxillary remodeling that are observed when different methods are used to superimpose maxillary images in roentgenographic cephalometrics. In a previous article, we reported cumulative changes in the positions of anterior nasal spine (ANS), posterior nasal spine (PNS), and Point A for a sample of 31 subjects with maxillary metallic implants. Measurements had been made on lateral cephalograms taken at annual intervals relative to superimposition on the implants. In the present article, we quantify the differences in the perceived displacement of the same landmarks in the same sample when a standard "anatomical best bit" rule was used in lieu of superimposition on the implants. The anatomical best fit superimposition as herein defined was found in this sample to lose important information on the downward remodeling of the superior surface of the maxilla that had been detected when the implant superimposition was used. In fact, we observed a small artifactual upward displacement of the ANS-PNS line. In the anteroposterior direction, the tendency toward backward displacement of skeletal landmarks through time that had been detected with the implant superimposition was replaced by a small forward displacement of ANS and Point A together with reduced backward displacement of PNS. To the extent that the implant superimposition is to be considered the true and correct one, the anatomical best fit superimposition appears to understate the true downward remodeling of the palate by an average of about 0.3 and 0.4 mm per year, although this value differs at different ages and timepoints. The anatomical best fit superimposition also misses entirely the small mean tendency toward backward remodeling that was observed when the implant superimposition was used. In situations in which there are no implants, clinicians and research workers must necessarily continue to use anatomically

  17. Clay Mask Workshop

    ERIC Educational Resources Information Center

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  18. Smoke Mask

    NASA Technical Reports Server (NTRS)

    2003-01-01

    Smoke inhalation injury from the noxious products of fire combustion accounts for as much as 80 percent of fire-related deaths in the United States. Many of these deaths are preventable. Smoke Mask, Inc. (SMI), of Myrtle Beach, South Carolina, is working to decrease these casualties with its line of life safety devices. The SMI personal escape hood and the Guardian Filtration System provide respiratory protection that enables people to escape from hazardous and unsafe conditions. The breathing filter technology utilized in the products is specifically designed to supply breathable air for 20 minutes. In emergencies, 20 minutes can mean the difference between life and death.

  19. Buried GaAs/GaAlAs laser with p-dopant implanted stripe as a mask for liquid-phase epitaxy regrowth

    SciTech Connect

    Menigaux, L.; Sansonetti, P.; Brandon, J.; Henoc, P.

    1987-08-15

    Buried GaAs/GaAlAs double heterostructure lasers have been realized by combining a double heterostructure grown by metalorganic chemical vapor deposition, p-dopant implantation, stripes chemical etching, and liquid-phase epitaxy (LPE) regrowth of n/sup -/ GaAlAs. Although the p-implanted top of the stripes were thermally annealed during the LPE burying, no regrowth occurred on them. Buried lasers were thus directly obtained while p-ohmic contact properties were good. The causes of such a phenomenon have been studied by transmission electron microscope and electron diffraction techniques. Typical threshold currents of 12 mA for a 270-..mu..m cavity length were obtained. This technology offers the potential of low ohmic contact resistivity.

  20. Masks: Interpretations and Variations.

    ERIC Educational Resources Information Center

    Basso, Robert

    1990-01-01

    Presents a high school art teacher's views of and experiences with masks. Outlines a maskmaking activity in which students were required to create variations on existing masks. Emphasizes use of experimental materials. Displays examples of student-created masks. (DB)

  1. Masks and Other Disguises.

    ERIC Educational Resources Information Center

    Ploghoft, Debra

    Instructions for making simple masks are provided in this guide for teachers of elementary children. Directions with illustrations are given for constructing masks from paper plates, construction paper, plastic milk jugs, and papier-mache. Ideas include a clown mask, a flower mask, a top hat, a paper crown, and "Groucho" glasses. Types of masks…

  2. Shuttle mask floorplanning

    NASA Astrophysics Data System (ADS)

    Xu, Gang; Tian, Ruiqi; Wong, Martin D.; Reich, Alfred J.

    2003-12-01

    A shuttle mask has different chips on the same mask. The chips are not electrically connected. Alliance and foundry customers can utilize shuttle masks to share the rising cost of mask and wafer manufacturing. This paper studies the shuttle mask floorplan problem, which is formulated as a rectangle-packing problem with constraints of final die sawing strategy and die-to-die mask inspection. For our formulation, we offer a "merging" method that reduces the problem to an unconstrained slicing floorplan problem. Excellent results are obtained from the experiment with real industry data. We also study a "general" method and discuss the reason why it does not work very well.

  3. Masking the Color Wheel.

    ERIC Educational Resources Information Center

    Greene, Charlene

    1982-01-01

    Describes an art activity in which sixth graders made mirror-image masks using only two primary colors and one secondary color. Students discussed the effect of color combinations and the use of masks in folk and modern cultures. (AM)

  4. Helium Migration Mechanisms in Polycrystalline Uranium Dioxide

    SciTech Connect

    Martin, Guillaume; Desgardin, Pierre; Sauvage, Thierry; Barthe, Marie-France; Garcia, Philippe; Carlot, Gaelle

    2007-07-01

    This study aims at identifying the release mechanisms of helium in uranium dioxide. Two sets of polycrystalline UO{sub 2} sintered samples presenting different microstructures were implanted with {sup 3}He ions at concentrations in the region of 0.1 at.%. Changes in helium concentrations were monitored using two Nuclear Reaction Analysis (NRA) techniques based on the {sup 3}He(d,{alpha}){sup 1}H reaction. {sup 3}He release is measured in-situ during sample annealing at temperatures ranging between 700 deg. C and 1000 deg. C. Accurate helium depth profiles are generated after each annealing stage. Results that provide data for further understanding helium release mechanisms are discussed. It is found that helium diffusion appears to be enhanced above 900 deg. C in the vicinity of grain boundaries possibly as a result of the presence of defects. (authors)

  5. Attention Attenuates Metacontrast Masking

    ERIC Educational Resources Information Center

    Boyer, Jennifer; Ro, Tony

    2007-01-01

    The influence of attention on perceptual awareness was examined using metacontrast masking. Attention was manipulated with endogenous cues to assess the effects on the temporal and spatial parameters of target visibility. Experiment 1 examined the time course of effective masking when the target and mask set were presented at an attended vs. an…

  6. Keeping African Masks Real

    ERIC Educational Resources Information Center

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  7. Mask degradation monitoring with aerial mask inspector

    NASA Astrophysics Data System (ADS)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  8. 2013 mask industry survey

    NASA Astrophysics Data System (ADS)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  9. Binary mask programmable hologram.

    PubMed

    Tsang, P W M; Poon, T-C; Zhou, Changhe; Cheung, K W K

    2012-11-19

    We report, for the first time, the concept and generation of a novel Fresnel hologram called the digital binary mask programmable hologram (BMPH). A BMPH is comprised of a static, high resolution binary grating that is overlaid with a lower resolution binary mask. The reconstructed image of the BMPH can be programmed to approximate a target image (including both intensity and depth information) by configuring the pattern of the binary mask with a simple genetic algorithm (SGA). As the low resolution binary mask can be realized with less stringent display technology, our method enables the development of simple and economical holographic video display.

  10. Object Substitution Masking: When Does Mask Preview Work?

    ERIC Educational Resources Information Center

    Lim, Stephen Wee Hun; Chua, Fook K.

    2008-01-01

    When a target is enclosed by a 4-dot mask that persists after the target disappears, target identification is worse than it is when the mask terminates with the target. This masking effect is attributed to object substitution masking (OSM). Previewing the mask, however, attenuates OSM. This study investigated specific conditions under which mask…

  11. Helium solubility in SON68 nuclear waste glass

    SciTech Connect

    Fares, Toby; Peuget, Sylvain; Bouty, Olivier; Broudic, Veronique; Maugeri, Emilio; Bes, Rene; Jegou, Christophe; Chamssedine, Fadel; Sauvage, Thierry; Deschanels, Xavier

    2012-12-15

    Helium behavior in a sodium borosilicate glass (SON68) dedicated to the immobilization of high-level nuclear waste is examined. Two experimental approaches on nonradioactive glass specimens are implemented: pressurized helium infusion experiments and {sup 3}He ion implantation experiments. The temperature variation of helium solubility in SON68 glass was determined and analyzed with the harmonic oscillator model to determine values of the energy of interaction E(0) at the host sites (about -4000 J/mol), the vibration frequency (about 1.7 x 10{sup 11} s{sup -1}), and the density of solubility sites (2.2 x 10{sup 21} sites cm{sup -3}). The implantation experiments show that a non diffusive transport phenomenon (i.e., athermal diffusion) is involved in the material when the helium concentration exceeds 2.3 x 10{sup 21} He cm{sup -3}, and thus probably as soon as it exceeds the density of solubility sites accessible to helium in the glass. We propose that this transport mechanism could be associated with the relaxation of the stress gradient induced by the implanted helium profile, which is favored by the glass damage. Microstructural characterization by TEM and ESEM of glass specimens implanted with high helium concentrations showed a homogeneous microstructure free of bubbles, pores, or cracking at a scale of 10 nm. (authors)

  12. Enhanced patterning by tilted ion implantation

    NASA Astrophysics Data System (ADS)

    Kim, Sang Wan; Zheng, Peng; Kato, Kimihiko; Rubin, Leonard; Liu, Tsu-Jae King

    2016-03-01

    Tilted ion implantation (TII) is proposed as a lower-cost alternative to self-aligned double patterning (SADP) for pitch halving. This new approach is based on an enhancement in etch rate of a hard-mask layer by implant-induced damage. Ar+ implantation into a thin layer of silicon dioxide (SiO2) is shown to enhance its etch rate in dilute hydrofluoric acid (HF) solution, by up to 9× for an implant dose of 3×1014 cm-2. The formation of sub-lithographic features defined by masked tilted Ar+ implantation into a SiO2 hard-mask layer is experimentally demonstrated. Features with sizes as small as ~21 nm, self-aligned to the lithographically patterned mask, are achieved. As compared with SADP, enhanced patterning by TII requires far fewer and lower-cost process steps and hence is expected to be much more cost-effective.

  13. Enhancement in Informational Masking

    ERIC Educational Resources Information Center

    Cao, Xiang; Richards, Virginia M.

    2012-01-01

    Purpose: The ability to detect a tone added to a random masker improves when a preview of the masker is provided. In 2 experiments, the authors explored the role that perceptual organization plays in this release from masking. Method: Detection thresholds were measured in informational masking studies. The maskers were drawn at random prior to…

  14. Lightweight Face Mask

    NASA Technical Reports Server (NTRS)

    Cason, W. E. I.; Baucom, R. M.; Evans, R. C.

    1982-01-01

    Lightweight face mask originally developed to protect epileptic patients during seizures could have many other medical and nonmedical applications such as muscular distrophy patients, football linesmen and riot-control police. Masks are extremely lightweight, the lightest of the configurations weighing only 136 grams.

  15. Large area self-assembled masking for photonic applications

    NASA Astrophysics Data System (ADS)

    Nagy, N.; Pap, A. E.; Horváth, E.; Volk, J.; Bársony, I.; Deák, A.; Hórvölgyi, Z.

    2006-08-01

    Ordered porous structures for photonic application were fabricated on p- and n-type silicon by means of masking against ion implantation with Langmuir-Blodgett (LB) films. LB films from Stöber silica spheres [J. Colloid Interface Sci. 26, 62 (1968)] of 350nm diameter were applied in the boron and phosphorus ion-implantation step, thereby offering a laterally periodic doping pattern. Ordered porous silicon structures were obtained after performing an anodic etch and were then removed by alkaline etching resulting in the required two-dimensional photonic arrangement. The LB silica masks and the resulting silicon structures were studied by field emission scanning electron microscope analysis.

  16. Optical Forces on Metastable Helium

    NASA Astrophysics Data System (ADS)

    Corder, Christopher Scott

    Optical forces using lasers allow precise control over the motion of atoms. The bichromatic optical force (BF) is unique in its large magnitude and velocity range, arising from the absorption and stimulated emission processes. These properties were used to transversely collimate a beam of metastable helium (He*) using the 23S - 23P transition. The collimation created a very bright beam of He*, allowing experiments of neutral atom lithography. The He* beam was used to pattern material surfaces using a resist-based lithography technique, where the pattern was determined by either mechanical or optical masks. The optical masks produced features with a separation of half the wavelength of the light used. Patterning was successfully demonstrated with both IR and UV optical masks. The etched pattern resolution was ˜ 100 nm and limited by the material surface. Further experiments were performed studying the ability of the bichromatic force to cool. The finite velocity range of the BF allows estimation of a characteristic cooling time which is independent of the excited state lifetime, only depending on the atomic mass and optical transition energy. Past experiments, including the helium collimation used for neutral atom lithography, have demonstrated that the BF can collimate and longitudinally slow atomic beams, but required long interaction times that included many spontaneous emission (SE) events. The effect of SE can be mitigated, and is predicted to not be necessary for BF cooling. Since the BF cooling time is not related to the excited state lifetime, a transition can be chosen such that the cooling time is shorter than the SE cycle time, allowing direct laser cooling on atoms and molecules that do not have cycling transitions. Experiments using the helium 2 3S-3P transition were chosen because the BF cooling time (285 ns) is on the order of the average SE cycle time (260 ns). Numerical simulations of the experimental system were run predicting compression of the

  17. 2012 Mask Industry Survey

    NASA Astrophysics Data System (ADS)

    Malloy, Matt; Litt, Lloyd C.

    2012-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year's survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.

  18. Helium Diffusion in Olivine

    NASA Astrophysics Data System (ADS)

    Cherniak, D. J.; Watson, E. B.

    2011-12-01

    Diffusion of helium has been characterized in natural Fe-bearing olivine (~Fo90) and synthetic forsterite. Polished, oriented slabs of olivine were implanted with 3He, at 100 keV at a dose of 5x1015/cm2 or at 3.0 MeV at a dose of 1x1016/cm2. A set of experiments on the implanted olivine were run in 1-atm furnaces. In addition to the one-atm experiments, experiments on implanted samples were also run at higher pressures (2.6 and 2.7 GPa) to assess the potential effects of pressure on He diffusion and the applicability of the measured diffusivities in describing He transport in the mantle. The high-pressure experiments were conducted in a piston-cylinder apparatus using an "ultra-soft" pressure cell, with the diffusion sample directly surrounded by AgCl. 3He distributions following experiments were measured with Nuclear Reaction Analysis using the reaction 3He(d,p)4He. This direct profiling method permits us to evaluate anisotropy of diffusion, which cannot be easily assessed using bulk-release methods. For diffusion in forsterite parallel to c we obtain the following Arrhenius relation over the temperatures 250-950°C: D = 3.91x10-6exp(-159 ± 4 kJ mol-1/RT) m2/sec. The data define a single Arrhenius line spanning more than 7 orders of magnitude in D and 700°C in temperature. Diffusion parallel to a appears slightly slower, yielding an activation energy for diffusion of 135 kJ/mol and a pre-exponential factor of 3.73x10-8 m2/sec. Diffusion parallel to b is slower than diffusion parallel to a (by about two-thirds of a log unit); for this orientation an activation energy of 138 kJ/mol and a pre-exponential factor of 1.34x10-8 m2/sec are obtained. This anisotropy is broadly consistent with observations for diffusion of Ni and Fe-Mg in olivine. Diffusion in Fe-bearing olivine (transport parallel to b) agrees within uncertainty with findings for He diffusion in forsterite. The higher-pressure experiments yield diffusivities in agreement with those from the 1-atm

  19. Protective Face Mask

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Mask to protect the physically impaired from injuries to the face and head has been developed by Langley Research Center. It is made of composite materials, usually graphite or boron fibers woven into a matrix. Weighs less than three ounces.

  20. EUVL Mask Blank Repair

    SciTech Connect

    Barty, A; Mirkarimi, P; Stearns, D G; Sweeney, D; Chapman, H N; Clift, M; Hector, S; Yi, M

    2002-05-22

    EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Small defects in this thin film coating can significantly alter the reflected field and introduce defects in the printed image. Ideally one would want to produce defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to effectively repair multilayer defects, and to this effect they present two complementary defect repair strategies for use on multilayer-coated EUVL mask blanks. A defect is any area on the mask which causes unwanted variations in EUV dose in the aerial image obtained in a printing tool, and defect repair is correspondingly defined as any strategy that renders a defect unprintable during exposure. The term defect mitigation can be adopted to describe any strategy which renders a critical defect non-critical when printed, and in this regard a non-critical defect is one that does not adversely affect device function. Defects in the patterned absorber layer consist of regions where metal, typically chrome, is unintentionally added or removed from the pattern leading to errors in the reflected field. There currently exists a mature technology based on ion beam milling and ion beam assisted deposition for repairing defects in the absorber layer of transmission lithography masks, and it is reasonable to expect that this technology will be extended to the repair of absorber defects in EUVL masks. However, techniques designed for the repair of absorber layers can not be directly applied to the repair of defects in the mask blank, and in particular the multilayer film. In this paper they present for the first time a new technique for the repair of amplitude defects as well as recent results on the repair of phase defects.

  1. Mask Industry Assessment: 2011

    NASA Astrophysics Data System (ADS)

    Chan, Y. David

    2011-11-01

    A survey supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the tenth in the current series of annual reports. With ongoing industry support, the report has been used as one of the baselines to gain perspective on the technical and business status of the mask and microelectronics industries. It continues to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was essentially the same as the 2005 through 2010 surveys. Questions are grouped into following categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.

  2. Mask Industry Assessment: 2010

    NASA Astrophysics Data System (ADS)

    Hughes, Greg; Chan, David Y.

    2010-09-01

    A survey created supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the ninth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. It will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was basically the same as the 2005 through 2009 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.

  3. New mask technology challenges

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  4. Masks: The Artist in Me

    ERIC Educational Resources Information Center

    Skophammer, Karen

    2009-01-01

    Whether masks are made from cardboard, papier-mache, metal, wood, leather, fabric, clay or any combination of these materials, they bring out the artist in people. Young children like to wear masks when they play to pretend they were another person or animal. Masks let them fantasize and be creative. The author's students made masks representing…

  5. Helium-Recycling Plant

    NASA Technical Reports Server (NTRS)

    Cook, Joseph

    1996-01-01

    Proposed system recovers and stores helium gas for reuse. Maintains helium at 99.99-percent purity, preventing water vapor from atmosphere or lubricating oil from pumps from contaminating gas. System takes in gas at nearly constant low back pressure near atmospheric pressure; introduces little or no back pressure into source of helium. Concept also extended to recycling of other gases.

  6. Orion Emergency Mask Approach

    NASA Technical Reports Server (NTRS)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  7. Orion Emergency Mask Approach

    NASA Technical Reports Server (NTRS)

    Tuan, George C.; Graf, John C.

    2008-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction temperature and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  8. Helium technology issues

    NASA Technical Reports Server (NTRS)

    Kittel, Peter

    1987-01-01

    A number of future space missions require liquid helium for cooling scientific payloads. These missions will require the long term storage and resupply of liquid helium at temperatures of 1.4 - 2.1 Kelvin. In addition, some of the proposed instruments will require refrigeration to temperatures as low as 50 mK. A variety of liquid helium based refrigerator systems could provide this subkelvin cooling. The status of helium storage and refrigeration technologies and of several alternative technologies is presented here along with areas where further research and development are needed. (Helium resupply technologies are the topic of another presentation at this symposium). The technologies covered include passive and dynamic liquid helium storage, alternatives to liquid helium storage, He -3 refrigerators, He -3/He -4 dilution refrigerators, and alternative sub-kelvin coolers.

  9. Masked mycotoxins: A review

    PubMed Central

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders. PMID:23047235

  10. Masked mycotoxins: a review.

    PubMed

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders.

  11. COAs: Behind the Masks.

    ERIC Educational Resources Information Center

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational, print, and…

  12. CADAT integrated circuit mask analysis

    NASA Technical Reports Server (NTRS)

    1981-01-01

    CADAT System Mask Analysis Program (MAPS2) is automated software tool for analyzing integrated-circuit mask design. Included in MAPS2 functions are artwork verification, device identification, nodal analysis, capacitance calculation, and logic equation generation.

  13. Helium bubble evolution in a Zr–Sn–Nb–Fe–Cr alloy during post-annealing: An in-situ investigation

    SciTech Connect

    Shen, H.H.; Peng, S.M.; Chen, B.; Naab, F.N.; Sun, G.A.; Zhou, W.; Xiang, X.; Sun, K.; Zu, X.T.

    2015-09-15

    The formation of helium bubbles is considered to be detrimental to the mechanical performance of the nuclear materials. The growth behaviors of helium bubbles in a helium ion implanted Zr–Sn–Nb–Fe–Cr alloy with respect to the helium fluence and subsequently annealing procedure were investigated by in-situ transmission electron microscopy. In the as-implanted sample, the measured size distributions of the helium bubbles are consistent with the simulated helium concentrations. Moreover, the mean size of the helium bubbles increases with the increase of the irradiation temperatures and the helium fluence. The in-situ heating study performed in a transmission electron microscope indicates that the mean size of the helium bubbles increase slowly below 923 K and dramatically above 923 K. The coarsening mechanism of the helium bubbles in the alloy is suggested based on the study. - Highlights: • Helium bubble growth in zirconium with annealing was in-situ investigated in TEM. • The mean helium bubble size increase with helium fluence and annealing temperature. • Helium bubble size distribution is same as that of helium concentration by SRIM. • Mean bubble size increases slowly and quickly with temperature below and above 923 K. • The growth mechanism of the helium bubbles in Zr alloy has been discussed.

  14. Mask Blank Defect Detection

    SciTech Connect

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask inspection will be

  15. Nanostructures from hydrogen implantation of metals.

    SciTech Connect

    McWatters, Bruce Ray; Causey, Rion A.; DePuit, Ryan J.; Yang, Nancy Y. C.; Ong, Markus D.

    2009-09-01

    This study investigates a pathway to nanoporous structures created by hydrogen implantation in aluminum. Previous experiments for fusion applications have indicated that hydrogen and helium ion implantations are capable of producing bicontinuous nanoporous structures in a variety of metals. This study focuses specifically on hydrogen and helium implantations of aluminum, including complementary experimental results and computational modeling of this system. Experimental results show the evolution of the surface morphology as the hydrogen ion fluence increases from 10{sup 17} cm{sup -2} to 10{sup 18} cm{sup -2}. Implantations of helium at a fluence of 10{sup 18} cm{sup -2} produce porosity on the order of 10 nm. Computational modeling demonstrates the formation of alanes, their desorption, and the resulting etching of aluminum surfaces that likely drives the nanostructures that form in the presence of hydrogen.

  16. Helium segregation on surfaces of plasma-exposed tungsten.

    PubMed

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D; Wirth, Brian D

    2016-02-17

    We report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He n (1⩽  n  ⩽  7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides the thermodynamic driving force for surface segregation. This elastic interaction force induces drift fluxes of these mobile He n clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters' drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. These near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components. PMID:26794828

  17. Helium segregation on surfaces of plasma-exposed tungsten

    DOE PAGES

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D.; Wirth, Brian D.

    2016-01-21

    Here we report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He-n (1 <= n <= 7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides themore » thermodynamic driving force for surface segregation. Elastic interaction force induces drift fluxes of these mobile Hen clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters' drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. Moreover, these near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components.« less

  18. Helium segregation on surfaces of plasma-exposed tungsten.

    PubMed

    Maroudas, Dimitrios; Blondel, Sophie; Hu, Lin; Hammond, Karl D; Wirth, Brian D

    2016-02-17

    We report a hierarchical multi-scale modeling study of implanted helium segregation on surfaces of tungsten, considered as a plasma facing component in nuclear fusion reactors. We employ a hierarchy of atomic-scale simulations based on a reliable interatomic interaction potential, including molecular-statics simulations to understand the origin of helium surface segregation, targeted molecular-dynamics (MD) simulations of near-surface cluster reactions, and large-scale MD simulations of implanted helium evolution in plasma-exposed tungsten. We find that small, mobile He n (1⩽  n  ⩽  7) clusters in the near-surface region are attracted to the surface due to an elastic interaction force that provides the thermodynamic driving force for surface segregation. This elastic interaction force induces drift fluxes of these mobile He n clusters, which increase substantially as the migrating clusters approach the surface, facilitating helium segregation on the surface. Moreover, the clusters' drift toward the surface enables cluster reactions, most importantly trap mutation, in the near-surface region at rates much higher than in the bulk material. These near-surface cluster dynamics have significant effects on the surface morphology, near-surface defect structures, and the amount of helium retained in the material upon plasma exposure. We integrate the findings of such atomic-scale simulations into a properly parameterized and validated spatially dependent, continuum-scale reaction-diffusion cluster dynamics model, capable of predicting implanted helium evolution, surface segregation, and its near-surface effects in tungsten. This cluster-dynamics model sets the stage for development of fully atomistically informed coarse-grained models for computationally efficient simulation predictions of helium surface segregation, as well as helium retention and surface morphological evolution, toward optimal design of plasma facing components.

  19. Masked multichannel analyzer

    DOEpatents

    Winiecki, A.L.; Kroop, D.C.; McGee, M.K.; Lenkszus, F.R.

    1984-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  20. Masked multichannel analyzer

    DOEpatents

    Winiecki, Alan L.; Kroop, David C.; McGee, Marilyn K.; Lenkszus, Frank R.

    1986-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  1. Mask strategy at International SEMATECH

    NASA Astrophysics Data System (ADS)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  2. The Attentional Dynamics of Masked Detection

    ERIC Educational Resources Information Center

    Smith, Philip L.; Wolfgang, Bradley J.

    2004-01-01

    A dichoptic masking procedure was used to test whether the mask-dependent cuing effects found in luminance detection by P. L. Smith (2000a) were due to integration masking or interruption masking. Attentional cuing enhanced detection sensitivity (d') when stimuli were backwardly masked with either dichoptic or monoptic masks, whereas no cuing…

  3. Revisiting mask contact hole measurements

    NASA Astrophysics Data System (ADS)

    Higuchi, Masaru; Gallagher, Emily; Ceperley, Daniel; Brunner, Timothy; Bowley, Reg; McGuire, Anne

    2006-10-01

    Contact holes represent one of the biggest critical dimension (CD) mask metrology challenges for 45nm technology mask development. The challenge is a consequence of both wafer and mask sensitivities. Large mask error factors and the small process windows found when contact holes are imaged on wafers impose very tight mask specifications for CD uniformity. The resultant CD error budget leaves little room for mask metrology. Current advanced mask metrology deploys a CD-SEM to characterize the mask contact hole CD uniformity. Measuring a contact hole is complex since it is inherently two-dimensional and is not always well-characterized by one-dimensional x- and y-axis measurements. This paper will investigate contact metrics such as line edge roughness (LER), region of interest (ROI) size, area, and CD sampling methods. The relative merits of each will be explored. Ultimately, an understanding of the connection between what is physically measured on the mask and what impacts wafer imaging must be understood. Simulations will be presented to explore the printability of a contact hole's physical attributes. The results will be summarized into a discussion of optimal contact hole metrology for 45nm technology node masks.

  4. Mask manufacturability improvement by MRC

    NASA Astrophysics Data System (ADS)

    Balasinski, A.; Coburn, D.; Buck, P.

    2007-10-01

    Mask data which can not be properly resolved by the mask writing tools, such as sub(resolution (reticle-scale) features or singularities can interfere with design intent or manufacturing capabilities in the absence of design guidelines or formal verification procedures. As a consequence, mask writing tools may introduce defects to device or metrology structures by snapping geometries to grid or misrepresenting process based sizing. To reduce the visibility of these defects by detuning inspection tools to release the mask with non-resolvable data in the production cycle or by waiving minimum CD rules compromises high fidelity of die pattern transfer to wafer. Driven by poor data quality, mask tool would provide degraded resolution without contextual analysis, such as correlations to the overlying and underlying mask layers and without regard to device models. The key reasons for this situation are arbitrary layout of technology structures and design layout-to-mask post-processing for OPC and fill pattern for which design has no intention or knowledge to intervene. The post-processing of mask data to eliminate errors effectively detaches design responsibility from the mask shop actions and may have other detrimental effects on the production cycle such as iterative defect analysis and long write times due to the large polygon count. In this work we propose mask rule check based on the principles to which the masks are being written and inspected. Running this mandatory rule set should reduce the product cycletime, benefit the cost and improve mask quality and reproduction of design intent. It feeds the prospective mask information back to the layout time making it possible to make design adjustments in the interest of pattern fidelity and device parameters.

  5. Mask fabrication process

    DOEpatents

    Cardinale, Gregory F.

    2000-01-01

    A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.

  6. A Masked Photocathode in Photoinjector

    SciTech Connect

    Qiang, Ji

    2010-12-14

    In this paper, we propose a masked photocathode inside the photoinjector for generating high brightness election beam. Instead of mounting the photocathode onto an electrode, an electrode with small hole is used as a mask to shield the photocathode from the accelerating vacuum chamber. Using such a masked photocathode will make the replacement of photocathode material easy by rotating the photocathode behind the electrode into the hole. Furthermore, this helps reduce the dark current or secondary electron emission from the photocathode material. The masked photocathode also provides transverse cut-off to a Gaussian laser beam that reduces electron beam emittance growth from nonlinear space-charge effects.

  7. Core helium flash

    SciTech Connect

    Cole, P.W.; Deupree, R.G.

    1980-01-01

    The role of convection in the core helium flash is simulated by two-dimensional eddies interacting with the thermonuclear runaway. These eddies are followed by the explicit solution of the 2D conservation laws with a 2D finite difference hydrodynamics code. Thus, no phenomenological theory of convection such as the local mixing length theory is required. The core helium flash is violent, producing a deflagration wave. This differs from the detonation wave (and subsequent disruption of the entire star) produced in previous spherically symmetric violent core helium flashes as the second dimension provides a degree of relief which allows the expansion wave to decouple itself from the burning front. Our results predict that a considerable amount of helium in the core will be burned before the horizontal branch is reached and that some envelope mass loss is likely.

  8. The Descending Helium Balloon

    ERIC Educational Resources Information Center

    Helseth, Lars Egil

    2014-01-01

    I describe a simple and fascinating experiment wherein helium leaks out of a rubber balloon, thereby causing it to descend. An estimate of the volumetric leakage rate is made by measuring its rate of descent.

  9. Advances in Helium Cryogenics

    NASA Astrophysics Data System (ADS)

    Sciver, S. W. Van

    This review provides a survey of major advances that have occurred in recent years in the area of helium cryogenics. Helium-temperature cryogenics is the enabling technology for a substantial and growing number of low-temperature systems from superconducting magnets to space-based experimental facilities. In recent years there have been many advances in the technology of low-temperature helium, driven mostly by new applications. However, to keep the review from being too broad, this presentation focuses mainly on three of the most significant advances. These are: (1) the development of large-scale recuperative refrigeration systems mainly for superconducting magnet applications in accelerators and other research facilities; (2) the use of stored superfluid helium (He II) as a coolant for spacebased astrophysics experiments; and (3) the application of regenerative cryocoolers operating at liquid helium temperatures primarily for cooling superconducting devices. In each case, the reader should observe that critical technologies were developed to facilitate these applications. In addition to these three primary advances, other significant helium cryogenic technologies are briefly reviewed at the end of this chapter, along with some vision for future developments in these areas.

  10. What Is Being Masked in Object Substitution Masking?

    ERIC Educational Resources Information Center

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  11. SEMATECH EUVL mask program status

    NASA Astrophysics Data System (ADS)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  12. Cochlear Implants.

    ERIC Educational Resources Information Center

    Clark, Catherine; Scott, Larry

    This brochure explains what a cochlear implant is, lists the types of individuals with deafness who may be helped by a cochlear implant, describes the process of evaluating people for cochlear implants, discusses the surgical process for implanting the aid, traces the path of sound through the cochlear implant to the brain, notes the costs of…

  13. Masked Proportional Routing

    NASA Technical Reports Server (NTRS)

    Wolpert, David

    2004-01-01

    Masked proportional routing is an improved procedure for choosing links between adjacent nodes of a network for the purpose of transporting an entity from a source node ("A") to a destination node ("B"). The entity could be, for example, a physical object to be shipped, in which case the nodes would represent waypoints and the links would represent roads or other paths between waypoints. For another example, the entity could be a message or packet of data to be transmitted from A to B, in which case the nodes could be computer-controlled switching stations and the links could be communication channels between the stations. In yet another example, an entity could represent a workpiece while links and nodes could represent, respectively, manufacturing processes and stages in the progress of the workpiece towards a finished product. More generally, the nodes could represent states of an entity and the links could represent allowed transitions of the entity. The purpose of masked proportional routing and of related prior routing procedures is to schedule transitions of entities from their initial states ("A") to their final states ("B") in such a manner as to minimize a cost or to attain some other measure of optimality or efficiency. Masked proportional routing follows a distributed (in the sense of decentralized) approach to probabilistically or deterministically choosing the links. It was developed to satisfy a need for a routing procedure that 1. Does not always choose the same link(s), even for two instances characterized by identical estimated values of associated cost functions; 2. Enables a graceful transition from one set of links to another set of links as the circumstances of operation of the network change over time; 3. Is preferably amenable to separate optimization of different portions of the network; 4. Is preferably usable in a network in which some of the routing decisions are made by one or more other procedure(s); 5. Preferably does not cause an

  14. Masked Repetition Priming Using Magnetoencephalography

    ERIC Educational Resources Information Center

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  15. Combining Simultaneous with Temporal Masking

    ERIC Educational Resources Information Center

    Hermens, Frouke; Herzog, Michael H.; Francis, Gregory

    2009-01-01

    Simultaneous and temporal masking are two frequently used techniques in psychology and vision science. Although there are many studies and theories related to each masking technique, there are no systematic investigations of their mutual relationship, even though both techniques are often applied together. Here, the authors show that temporal…

  16. Mask registration and wafer overlay

    NASA Astrophysics Data System (ADS)

    Lee, Chulseung; Bang, Changjin; Kim, Myoungsoo; Kang, Hyosang; Lee, Dohwa; Jeong, Woonjae; Lim, Ok-Sung; Yoon, Seunghoon; Jung, Jaekang; Laske, Frank; Parisoli, Lidia; Roeth, Klaus-Dieter; Robinson, John C.; Jug, Sven; Izikson, Pavel; Dinu, Berta; Widmann, Amir; Choi, DongSub

    2010-03-01

    Overlay continues to be one of the key challenges for lithography in advanced semiconductor manufacturing. It becomes even more challenging due to the continued shrinking of the device node. Some low k1 techniques, such as Double Exposure and Double Patterning also add additional loss of the overlay margin due to the fact that the single layer pattern is created based on more than 1 exposure. Therefore, the overlay between 2 exposures requires very tight overlay specification. Mask registration is one of the major contributors to wafer overlay, especially field related overlay. We investigated mask registration and wafer overlay by co-analyzing the mask data and the wafer overlay data. To achieve the accurate cohesive results, we introduced the combined metrology mark which can be used for both mask registration measurement as well as for wafer overlay measurement. Coincidence of both metrology marks make it possible to subtract mask signature from wafer overlay without compromising the accuracy due to the physical distance between measurement marks, if we use 2 different marks for both metrologies. Therefore, it is possible to extract pure scanner related signatures, and to analyze the scanner related signatures in details to in order to enable root cause analysis and ultimately drive higher wafer yield. We determined the exact mask registration error in order to decompose wafer overlay into mask, scanner, process and metrology. We also studied the impact of pellicle mounting by comparison of mask registration measurement pre-pellicle mounting and post-pellicle mounting in this investigation.

  17. Advanced Mask Aligner Lithography (AMALITH)

    NASA Astrophysics Data System (ADS)

    Voelkel, Reinhard; Vogler, Uwe; Bramati, Arianna

    2015-03-01

    Mask aligner lithography is very attractive for less-critical lithography layers and is widely used for LED, display, CMOS image sensor, micro-fluidics and MEMS manufacturing. Mask aligner lithography is also a preferred choice the semiconductor back-end for 3D-IC, TSV interconnects, advanced packaging (AdP) and wafer-level-packaging (WLP). Mask aligner lithography is a mature technique based on shadow printing and has not much changed since the 1980s. In shadow printing lithography a geometric pattern is transferred by free-space propagation from a photomask to a photosensitive layer on a wafer. The inherent simplicity of the pattern transfer offers ease of operation, low maintenance, moderate capital expenditure, high wafers-per-hour (WPH) throughput, and attractive cost-of-ownership (COO). Advanced mask aligner lithography (AMALITH) comprises different measures to improve shadow printing lithography beyond current limits. The key enabling technology for AMALITH is a novel light integrator systems, referred to as MO Exposure Optics® (MOEO). MOEO allows to fully control and shape the properties of the illumination light in a mask aligner. Full control is the base for accurate simulation and optimization of the shadow printing process (computational lithography). Now photolithography enhancement techniques like customized illumination, optical proximity correction (OPC), phase masks (AAPSM), half-tone lithography and Talbot lithography could be used in mask aligner lithography. We summarize the recent progress in advanced mask aligner lithography (AMALITH) and discuss possible measures to further improve shadow printing lithography.

  18. Defect tolerant transmission lithography mask

    DOEpatents

    Vernon, Stephen P.

    2000-01-01

    A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

  19. Programmable RET Mask Layout Verification

    NASA Astrophysics Data System (ADS)

    Beale, Daniel F.; Mayhew, Jeffrey P.; Rieger, Michael L.; Tang, Zongwu

    2002-12-01

    Emerging resolution enhancement techniques (RET) and OPC are dramatically increasing the complexity of mask layouts and, in turn, mask verification. Mask shapes needed to achieve required results on the wafer diverge significantly from corresponding shapes in the physical design, and in some cases a single chip layer may be decomposed into two masks used in multiple exposures. The mask verification challenge is to certify that a RET-synthesized mask layout will produce an acceptable facsimile of the design intent expressed in the design layout. Furthermore costs, tradeoffs between mask-complexity, design intent, targeted process latitude, and other factors are playing a growing role in helping to control rising mask costs. All of these considerations must in turn be incorporated into the mask layout verification strategy needed for data prep sign-off. In this paper we describe a technique for assessing the lithographic quality of mask layouts for diverse RET methods while effectively accommodating various manufacturing objectives and specifications. It leverages the familiar DRC paradigm for identifying errors and producing DRC-like error shapes in its output layout. It integrates a unique concept of "check figures" - layer-based geometries that dictate where and how simulations of shapes on the wafer are to be compared to the original desired layout. We will show how this provides a highly programmable environment that makes it possible to engage in "compound" check strategies that vary based on design intent and adaptive simulation with multiple checks. Verification may be applied at the "go/no go" level or can be used to build a body of data for quantitative analysis of lithographic behavior at multiple process conditions or for specific user-defined critical features. In addition, we will outline automated methods that guide the selection of input parameters controlling specific verification strategies.

  20. Dental Implants

    MedlinePlus

    ... Procedures Dental Implants Dentures Direct Bonding Implants versus Bridges Orthodontics and Aligners Periodontal Plastic Surgery Porcelain Crowns Porcelain Fixed Bridges Porcelain Veneers Repairing Chipped Teeth Teeth Whitening Tooth- ...

  1. Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures.

    PubMed

    Bates, J R; Miyahara, Y; Burgess, J A J; Iglesias-Freire, O; Grütter, P

    2013-03-22

    Focused ion beam (FIB) milling is a common fabrication technique to make nanostencil masks which has the unintended consequence of gallium ion implantation surrounding milled features in silicon nitride membranes. We observe major changes in film structure, chemical composition, and magnetic behaviour of permalloy nanostructures deposited by electron beam evaporation using silicon nitride stencil masks made by a FIB as compared to stencil masks made by regular lithography techniques. We characterize the stenciled structures and both types of masks using transmission electron microscopy, electron energy loss spectroscopy, energy dispersive x-ray spectroscopy, magnetic force microscopy and kelvin probe force microscopy. All these techniques demonstrate distinct differences at a length scale of a 1-100 nm for the structures made using stencil mask fabricated using a FIB. The origin of these differences seems to be related to the presence of implanted ions, a detailed understanding of the mechanism however remains to be developed. PMID:23449320

  2. Bringing mask repair to the next level

    NASA Astrophysics Data System (ADS)

    Edinger, K.; Wolff, K.; Steigerwald, H.; Auth, N.; Spies, P.; Oster, J.; Schneider, H.; Budach, M.; Hofmann, T.; Waiblinger, M.

    2014-10-01

    Mask repair is an essential step in the mask manufacturing process as the extension of 193nm technology and the insertion of EUV are drivers for mask complexity and cost. The ability to repair all types of defects on all mask blank materials is crucial for the economic success of a mask shop operation. In the future mask repair is facing several challenges. The mask minimum features sizes are shrinking and require a higher resolution repair tool. At the same time mask blanks with different new mask materials are introduced to optimize optical performance and long term durability. For EUV masks new classes of defects like multilayer and phase defects are entering the stage. In order to achieve a high yield, mask repair has to cover etch and deposition capabilities and must not damage the mask. These challenges require sophisticated technologies to bring mask repair to the next level. For high end masks ion-beam based and e-based repair technologies are the obvious choice when it comes to the repair of small features. Both technologies have their pro and cons. The scope of this paper is to review and compare the performance of ion-beam based mask repair to e-beam based mask repair. We will analyze the limits of both technologies theoretically and experimentally and show mask repair related performance data. Based on this data, we will give an outlook to future mask repair tools.

  3. Masks for extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G; Goldsmith, J; Kearney, P A; Larson, C; Moore, C E; Prisbrey, S; Tong, W; Vernon, S P; Weber, F; Yan, P-Y

    1998-09-01

    In extreme ultraviolet lithography (EUVL), the technology specific requirements on the mask are a direct consequence of the utilization of radiation in the spectral region between 10 and 15 nm. At these wavelengths, all condensed materials are highly absorbing and efficient radiation transport mandates the use of all-reflective optical systems. Reflectivity is achieved with resonant, wavelength-matched multilayer (ML) coatings on all of the optical surfaces - including the mask. The EUV mask has a unique architecture - it consists of a substrate with a highly reflective ML coating (the mask blank) that is subsequently over-coated with a patterned absorber layer (the mask). Particulate contamination on the EUVL mask surface, errors in absorber definition and defects in the ML coating all have the potential to print in the lithographic process. While highly developed technologies exist for repair of the absorber layer, no viable strategy for the repair of ML coating defects has been identified. In this paper the state-of-the-art in ML deposition technology, optical inspection of EUVL mask blank defects and candidate absorber patterning approaches are reviewed.

  4. [Masked hypertension: myth or reality?].

    PubMed

    Mallion, Jean-Michel; Ormezzano, Olivier; Barone-Rochette, Gilles; Neuder, Yannick; Salvat, Muriel; Baguet, Jean-Philippe

    2008-06-01

    Masked hypertension is also referred as reverse white coat hypertension. Masked hypertension is diagnosed in subjects who have normal clinic blood pressure (BP) <140/90 mmHg and elevated ambulatory BP or home BP, with daytime systolic BP> or = 135 mmHg or daytime diastolic BP > or = 85 mmHg. Its prevalence varies between 10 to at least 47% and differs substantially according to the reference population and the specific criteria.Subjects with masked hypertension have been shown to have more extensive target organ damage, specifically, a higher prevalence of carotid atherosclerosis and of left ventricular cardiac hypertrophy. Longitudinal studies of patients with masked hypertension show higher levels of cardiovascular morbidity and mortality than in reference populations. These studies show that ambulatory or home BP measurements predict risk much better than the usual clinical measurements and that those who are found to be hypertensive by ambulatory or home measurements have greater risks than those who are not. Who should be tested for masked hypertension? Our reference study shows that 3 characteristics are most likely to predict masked hypertension: male sex, age over 60 years, and office systolic BP of more than 130 mmHg. Masked hypertension is indeed a reality. Individual patients should be tested and treated, based on the physician's clinical judgment.

  5. Evolution of Plasma-Exposed Tungsten Surfaces Due to Helium Diffusion and Bubble Growth

    NASA Astrophysics Data System (ADS)

    Hammond, Karl; Hu, Lin; Maroudas, Dimitrios; Wirth, Brian; PSI-SciDAC Team

    2013-10-01

    Helium from linear plasma devices and tokamak plasmas causes the formation of microscopic features, termed ``fuzz'' or ``coral,'' on the surface of plasma-exposed materials after only a few hours of plasma exposure. The details of such surface modifications are only beginning to be understood. This study examines the initial and intermediate stages of fuzz formation by large-length-scale molecular dynamics (MD) simulations of helium-implanted tungsten over time scales of up to microseconds using single-crystalline and polycrystalline supercell models of tungsten. The large-scale MD simulations employ state-of-the-art many-body interatomic potentials and implantation depth distributions for the insertion of helium atoms into the tungsten matrix constructed based on MD simulations of helium-atom impingement onto tungsten surfaces under prescribed thermal and implantation conditions. The large-scale MD simulations reveal surface features formed via the sequence of helium implantation, diffusion of helium atoms and their aggregation to form bubbles, growth of bubbles and consequent production of tungsten self-interstitial atoms, organization of those atoms into prismatic loops, glide of those loops to the surface, and bubble rupture.

  6. Helium-refrigeration system

    SciTech Connect

    Specht, J.R.; Millar, B.; Sutherland, A.

    1995-08-01

    The design, procurement, and preliminary construction was completed for adding two more wet expansion engines to two helium refrigerators. These will be added in mid-year FY 1995. In addition a variable speed drive will be added to an existing helium compressor. This is part of an energy conservation upgrade project to reduce operating costs from the use of electricity and liquid nitrogen. This project involves the replacement of Joule-Thompson valves in the refrigerators with expansion engines resulting in system efficiency improvements of about 30% and improved system reliability.

  7. Is solid helium a supersolid?

    SciTech Connect

    Hallock, Robert

    2015-05-15

    Recent experiments suggest that helium-4 atoms can flow through an experimental cell filled with solid helium. But that incompletely understood flow is quite different from the reported superfluid-like motion that so excited physicists a decade ago.

  8. Mask side wall clamping

    NASA Astrophysics Data System (ADS)

    Naaijkens, G. J. P.; Rosielle, P. C. J. N.; Steinbuch, M.

    2013-04-01

    Current state-of-the-art optical lithography scanners using 193nm wavelength lasers and numerical apertures of 1.35 have reached fundamental printing limits. Yet, consumer demands and device trends continue to drive smaller feature sizes, and most IC manufacturers have already navigated beyond the lithographic printing limits by turning to double patterning techniques.1 Requiring an extra lithography step for these techniques, it is essential to keep costs down by e.g. increasing wafer throughput. Currently, leading edge immersion scanners consistently produce over 190 wafers per hour (wph). However, to keep decreasing the cost per transistor, higher throughputs of 250 wph are key targets for the year 20132. Amongst others, higher throughput can be acquired by increasing acceleration of the positioning stages. One of the constraining technologies is the current mask or reticle clamping concept due to its friction based acceleration. While current reticle accelerations amount to 150 m/s2, some research3 has already been performed to reticle stage accelerations of 400 m/s2. In this paper, a novel reticle clamping concept is presented. The concept is shown to be suitable for accelerations larger than 400 m/s2 entirely eliminating reticle slip, whilst meeting specifications for clamping induced error with a pattern deformation of < 0.12 nm on wafer stage level (WS) and comprising high clamp stiffness.

  9. Hg-Mask Coronagraph

    NASA Astrophysics Data System (ADS)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  10. Helium behaviour in waste conditioning matrices during thermal annealing

    NASA Astrophysics Data System (ADS)

    Wiss, T. A. G.; Hiernaut, J.-P.; Damen, P. M. G.; Lutique, S.; Fromknecht, R.; Weber, W. J.

    2006-06-01

    Reprocessing of spent fuel produces high level waste including minor actinides and long living fission products that might be disposed in waste conditioning matrices. Several natural mineral phases were proven to be able to incorporate fission products or actinides in their crystalline structure for long periods of time. In this study, synthetic compounds of zirconolite (CaZrTi2O7) and pyrochlores (Gd2Ti2O7 and Nd2Zr2O7) were fabricated and doped with the short-lived alpha-emitter 244Cm to increase the total amount of helium and damage generated in a laboratory time scale. Helium implantations were also used to simulate the damage caused by the alpha-decay and the build-up of helium in the matrix. The samples were annealed in a Knudsen cell, and the helium release profile interpreted in conjunction with radiation damage studies and previous analysis of annealing behaviour. Several processes like diffusion, trapping or phase changes could then be attributed to the helium behaviour depending on the material considered. Despite high damage and large amount of helium accumulated, the integrity of the studied materials was preserved during storage.

  11. Cavitation in flowing superfluid helium

    NASA Technical Reports Server (NTRS)

    Daney, D. E.

    1988-01-01

    Flowing superfluid helium cavitates much more readily than normal liquid helium, and there is a marked difference in the cavitation behavior of the two fluids as the lambda point is traversed. Examples of cavitation in a turbine meter and centrifugal pump are given, together with measurements of the cavitation strength of flowing superfluid helium. The unusual cavitation behavior of superfluid helium is attributed to its immense thermal conductivity .

  12. Measuring the Cold Mask Offset

    NASA Astrophysics Data System (ADS)

    Roye, E.; Krist, J.; Schultz, A. B.; Wiklind, T.

    2003-04-01

    An unexpected increase in measured thermal background during the Cycle 11 early calibration program caused speculation that the cold mask position could have shifted since Cycle 7. To address this concern, a single orbit NICMOS program was executed (Program ID: 9704) to obtain deep PSF images of the star LHS1846 in all three cameras. Analysis of this data using the Phase Retrieval software package revealed a minimal amount of cold mask shift since Cycle 7 and provided new, more accurate cold mask values for the Tiny Tim PSF modeling software. It was concluded that the cold mask position was not the cause of increased thermal background observed during the Cycle 11 early calibration program. Increased thermal background has since been determined to be the result of increased thermal load on the HST aft shroud due to the addition of ACS and NCS during SM3b.

  13. EUVL mask performance and optimization

    NASA Astrophysics Data System (ADS)

    Davydova, Natalia; de Kruif, Robert; van Setten, Eelco; Connolly, Brid; Mehagnoul, Karolien; Zimmerman, John; Harned, Noreen; Kalk, Franklin

    2012-02-01

    EUV lithography requires an exposure system with complex reflective optics and an equally complex EUV dedicated reflective mask. The required high level of reflectivity is obtained by using multilayers. The multilayer of the system optics and the mask are tuned to each other. The mask is equipped with an additional patterned absorber layer. The EUV mask is an optical element with many parameters that contribute to the final image and overlay quality on the wafer and the productivity of the system. Several of these parameters can be tuned for optimal overlay, imaging and productivity results. This should be done with care because of possible interaction between parameters. We will present an overview of the EUV mask contributors to the imaging, overlay and productivity performance for the 27 nm node and below, such as multilayer and absorber stack composition, reflectivity and reflectivity uniformity. These parameters will be reviewed in the context of real-life scanner parameters for the ASML NXE:3100 and NXE:3300 system configurations. The predictions will be compared to actual exposure results on NXE:3100 systems (NA=0.25) for various masks and extrapolated to the NXE:3300 (NA=0.33). In particular, we will present extensive multilayer and absorber actinic spectral reflectance measurements of a state-ofthe art EUV mask over a range of incidence angles corresponding to an NA of 0.33 at multiple positions within the image field. The ML measurements allow calibrating ML stack for imaging simulations. It allows also the estimation of mask-induced apodization effects having impact on overlay. In general, the reflectivity measurements will give detailed variations over the image field of mask parameters such as ML centroid wavelength and absorber reflectivity which contribute to CD uniformity. Such a relation will be established by means of rigorous full stack imaging simulations taking into account optical properties of the coming NXE:3300 system. Based on this

  14. Subdivisions with infinitely supported mask

    NASA Astrophysics Data System (ADS)

    Li, Song; Pan, Yali

    2008-04-01

    In this paper we investigate the convergence of subdivision schemes associated with masks being polynomially decay sequences. Two-scale vector refinement equations are the formwhere the vector of functions [phi]=([phi]1,E..,[phi]r)T is in and is polynomially decay sequence of rxr matrices called refinement mask. Associated with the mask a is a linear operator on given byBy using same methods in [B. Han, R. Q. Jia, Characterization of Riesz bases of wavelets generated from multiresolution analysis, manuscript]; [BE Han, Refinable functions and cascade algorithms in weighted spaces with infinitely supported masks, manuscript]; [R.Q. Jia, Q.T. Jiang, Z.W. Shen, Convergence of cascade algorithms associated with nonhomogeneous refinement equations, Proc. Amer. Math. Soc. 129 (2001) 415-427]; [R.Q. Jia, Convergence of vector subdivision schemes and construction of biorthogonal multiple wavelets, in: Advances in Wavelet, Hong Kong,1997, Springer, Singapore, 1998, pp. 199-227], a characterization of convergence of the sequences in the L2-norm is given, which extends the main results in [R.Q. Jia, S.D. Riemenschneider, D.X. Zhou, Vector subdivision schemes and multiple wavelets, Math. Comp. 67 (1998) 1533-1563] on convergence of the subdivision schemes associated with a finitely supported mask to the case in which mask a is polynomially decay sequence. As an application, we also obtain a characterization of smoothness of solutions of the refinement equation mentioned above for the case r=1.

  15. Ion implantation in polymers

    NASA Astrophysics Data System (ADS)

    Wintersgill, M. C.

    1984-02-01

    An introductory overview will be given of the effects of ion implantation on polymers, and certain areas will be examined in more detail. Radiation effects in general and ion implantation in particular, in the field of polymers, present a number of contrasts with those in ionic crystals, the most obvious difference being that the chemical effects of both the implanted species and the energy transfer to the host may profoundly change the nature of the target material. Common effects include crosslinking and scission of polymer chains, gas evolution, double bond formation and the formation of additional free radicals. Research has spanned the chemical processes involved, including polymerization reactions achievable only with the use of radiation, to applied research dealing both with the effects of radiation on polymers already in commercial use and the tailoring of new materials to specific applications. Polymers are commonly divided into two groups, in describing their behavior under irradiation. Group I includes materials which form crosslinks between molecules, whereas Group II materials tend to degrade. In basic research, interest has centered on Group I materials and of these polyethylene has been studied most intensively. Applied materials research has investigated a variety of polymers, particularly those used in cable insulation, and those utilized in ion beam lithography of etch masks. Currently there is also great interest in enhancing the conducting properties of polymers, and these uses would tend to involve the doping capabilities of ion implantation, rather than the energy deposition.

  16. Visual Masking During Pursuit Eye Movements

    ERIC Educational Resources Information Center

    White, Charles W.

    1976-01-01

    Visual masking occurs when one stimulus interferes with the perception of another stimulus. Investigates which matters more for visual masking--that the target and masking stimuli are flashed on the same part of the retina, or, that the target and mask appear in the same place. (Author/RK)

  17. The Meaning behind the Mask. [Lesson Plan].

    ERIC Educational Resources Information Center

    National Endowment for the Humanities (NFAH), Washington, DC.

    In this lesson plan, students explore the cultural significance of masks. After exploring the world of African masks and storytelling, they create masks that tell stories of their own. In these six lessons, students first recall contexts in which masks are worn in the United States, and then discuss their use in stories. Students then investigate…

  18. The mask of psychotic diagnoses.

    PubMed

    Garfield, David

    2003-01-01

    Chronic mental illness results in the patient becoming adhered to a DSM-IV diagnostic label. Over time, this diagnosis can expand and become a "mask" that invisibly covers over the true person of the patient. Most commonly, two things then occur. First, the outside world forgets that the patient is a person and family, friends, staff, and doctors begin to treat the patient according to the superficial aspects of what the mask of the diagnosis connotes, rather than connecting with the person struggling with the illness. Second and, perhaps, more insidious, is that the patient, who has been vulnerable and shattered by his or her experience and battle with the illness, adopts the mask as a kind of invisible protective shield. The task of making contact with the patient behind the mask of the diagnosis is therefore a formidable one for psychoanalysts and therapists and staff who work with seriously ill patients. Treatment must focus on the dual process of interfering with the patient's use of the diagnostic mask while, at the same time, making safe contact with the person of the patient behind the mask. A focus on affect can help achieve these dual goals. By utilizing Semrad's (Semrad and van Buskirk, 1969) method of noticing and asking about "feelings" as conveyed by hallucinations, delusions, or bodily sensations, a reliable relationship can evolve and the clinician can come to have an important "selfobject" (Kohut, 1971) meaning for the patient. By attuning to the patient's "vitality" affects (Stern, 1985), great stability and a new sense of "aliveness" is made possible to help the patient emerge from the deadening effects of the illness and the mask of the diagnosis. PMID:12722887

  19. IBA studies of helium mobility in nuclear materials revisited

    NASA Astrophysics Data System (ADS)

    Trocellier, P.; Agarwal, S.; Miro, S.; Vaubaillon, S.; Leprêtre, F.; Serruys, Y.

    2015-12-01

    The aim of this paper is to point out and to discuss some features extracted from the study of helium migration in nuclear materials performed during the last fifteen years using ion beam analysis (IBA) measurements. The first part of this paper is devoted to a brief description of the two main IBA methods used, i.e. deuteron induced nuclear reaction for 3He depth profiling and high-energy heavy-ion induced elastic recoil detection analysis for 4He measurement. In the second part, we provide an overview of the different studies carried out on model nuclear waste matrices and model nuclear reactor structure materials in order to illustrate and discuss specific results in terms of key influence parameters in relation with thermal or radiation activated migration of helium. Finally, we show that among the key parameters we have investigated as able to influence the height of the helium migration barrier, the following can be considered as pertinent: the experimental conditions used to introduce helium (implanted ion energy and implantation fluence), the grain size of the matrix, the lattice cell volume, the Young's modulus, the ionicity degree of the chemical bond between the transition metal atom M and the non-metal atom X, and the width of the band gap.

  20. Nanofabrication on unconventional substrates using transferred hard masks

    PubMed Central

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang-Yong; Schröder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-01

    A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates. PMID:25588550

  1. Nanofabrication on unconventional substrates using transferred hard masks

    SciTech Connect

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang -Yong; Schroder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-15

    Here, a major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

  2. Nanofabrication on unconventional substrates using transferred hard masks

    NASA Astrophysics Data System (ADS)

    Li, Luozhou; Bayn, Igal; Lu, Ming; Nam, Chang-Yong; Schröder, Tim; Stein, Aaron; Harris, Nicholas C.; Englund, Dirk

    2015-01-01

    A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.

  3. Applications of Groundwater Helium

    USGS Publications Warehouse

    Kulongoski, Justin T.; Hilton, David R.

    2011-01-01

    Helium abundance and isotope variations have widespread application in groundwater-related studies. This stems from the inert nature of this noble gas and the fact that its two isotopes ? helium-3 and helium-4 ? have distinct origins and vary widely in different terrestrial reservoirs. These attributes allow He concentrations and 3He/4He isotope ratios to be used to recognize and quantify the influence of a number of potential contributors to the total He budget of a groundwater sample. These are atmospheric components, such as air-equilibrated and air-entrained He, as well as terrigenic components, including in situ (aquifer) He, deep crustal and/or mantle He and tritiogenic 3He. Each of these components can be exploited to reveal information on a number of topics, from groundwater chronology, through degassing of the Earth?s crust to the role of faults in the transfer of mantle-derived volatiles to the surface. In this review, we present a guide to how groundwater He is collected from aquifer systems and quantitatively measured in the laboratory. We then illustrate the approach of resolving the measured He characteristics into its component structures using assumptions of endmember compositions. This is followed by a discussion of the application of groundwater He to the types of topics mentioned above using case studies from aquifers in California and Australia. Finally, we present possible future research directions involving dissolved He in groundwater.

  4. Education in Helium Refrigeration

    SciTech Connect

    Gistau Baguer, G. M.

    2004-06-23

    On the one hand, at the end of the time I was active in helium refrigeration, I noticed that cryogenics was stepping into places where it was not yet used. For example, a conventional accelerator, operating at room temperature, was to be upgraded to reach higher particle energy. On the other hand, I was a little bit worried to let what I had so passionately learned during these years to be lost. Retirement made time available, and I came gradually to the idea to teach about what was my basic job. I thought also about other kinds of people who could be interested in such lessons: operators of refrigerators or liquefiers who, often by lack of time, did not get a proper introduction to their job when they started, young engineers who begin to work in cryogenics... and so on.Consequently, I have assembled a series of lessons about helium refrigeration. As the audiences have different levels of knowledge in the field of cryogenics, I looked for a way of teaching that is acceptable for all of them. The course is split into theory of heat exchangers, refrigeration cycles, technology and operation of main components, process control, and helium purity.

  5. Cochlear Implants

    MedlinePlus

    ... electrodes are inserted. The electronic device at the base of the electrode array is then placed under ... FDA approval for implants The Food and Drug Administration (FDA) regulates cochlear implant devices for both adults ...

  6. Dental Implants.

    PubMed

    Zohrabian, Vahe M; Sonick, Michael; Hwang, Debby; Abrahams, James J

    2015-10-01

    Dental implants restore function to near normal in partially or completely edentulous patients. A root-form implant is the most frequently used type of dental implant today. The basis for dental implants is osseointegration, in which osteoblasts grow and directly integrate with the surface of titanium posts surgically embedded into the jaw. Radiologic assessment is critical in the preoperative evaluation of the dental implant patient, as the exact height, width, and contour of the alveolar ridge must be determined. Moreover, the precise locations of the maxillary sinuses and mandibular canals, as well as their relationships to the site of implant surgery must be ascertained. As such, radiologists must be familiar with implant design and surgical placement, as well as augmentation procedures utilized in those patients with insufficient bone in the maxilla and mandible to support dental implants.

  7. Helium anion formation inside helium droplets

    NASA Astrophysics Data System (ADS)

    Maalouf, Elias Jabbour Al; Reitshammer, Julia; Ribar, Anita; Scheier, Paul; Denifl, Stephan

    2016-07-01

    The formation of He∗- is examined with improved electron energy resolution of about 100 meV utilizing a hemispherical electron monochromator. The work presented provides a precise determination of the three previously determined resonance peak positions that significantly contribute to the formation of He∗- inside helium nanodroplets in the energy range from 20 eV to 29.5 eV. In addition, a new feature is identified located at 27.69 ± 0.18 eV that we assign to the presence of O2 as a dopant inside the droplet. With increasing droplet size a small blue shift of the resonance positions is observed. Also for the relatively low electron currents used in the present study (i.e., 15-70 nA) a quadratic dependence of the He∗- ion yield on the electron current is observed. Contribution to the Topical Issue "Advances in Positron and Electron Scattering", edited by Paulo Limao-Vieira, Gustavo Garcia, E. Krishnakumar, James Sullivan, Hajime Tanuma and Zoran Petrovic.

  8. Coatings on reflective mask substrates

    DOEpatents

    Tong, William Man-Wai; Taylor, John S.; Hector, Scott D.; Mangat, Pawitter J. S.; Stivers, Alan R.; Kofron, Patrick G.; Thompson, Matthew A.

    2002-01-01

    A process for creating a mask substrate involving depositing: 1) a coating on one or both sides of a low thermal expansion material EUVL mask substrate to improve defect inspection, surface finishing, and defect levels; and 2) a high dielectric coating, on the backside to facilitate electrostatic chucking and to correct for any bowing caused by the stress imbalance imparted by either other deposited coatings or the multilayer coating of the mask substrate. An film, such as TaSi, may be deposited on the front side and/or back of the low thermal expansion material before the material coating to balance the stress. The low thermal expansion material with a silicon overlayer and a silicon and/or other conductive underlayer enables improved defect inspection and stress balancing.

  9. EUV mask particle adders during scanner exposure

    NASA Astrophysics Data System (ADS)

    Hyun, Yoonsuk; Kim, Jinsoo; Kim, Kyuyoung; Koo, Sunyoung; Kim, SeoMin; Kim, Youngsik; Lim, Changmoon; Kwak, Nohjung

    2015-03-01

    As EUV reaches high volume manufacturing, scanner source power and reticle defectivity attract a lot of attention. Keeping a EUV mask clean after mask production is as essential as producing a clean EUV mask. Even though EUV pellicle is actively investigated, we might expose EUV masks without EUV pellicle for some time. To keep clean EUV mask under pellicle-less lithography, EUV scanner cleanliness needs to meet the requirement of high volume manufacturing. In this paper, we will show the cleanliness of EUV scanners in view of mask particle adders during scanner exposure. From this we will find several tendencies of mask particle adders depending on mask environment in scanner. Further we can categorize mask particle adders, which could show the possible causes of particle adders during exposure in scanners.

  10. Accurate mask model for advanced nodes

    NASA Astrophysics Data System (ADS)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Ndiaye, El Hadji Omar; Mishra, Kushlendra; Paninjath, Sankaranarayanan; Bork, Ingo; Buck, Peter; Toublan, Olivier; Schanen, Isabelle

    2014-07-01

    Standard OPC models consist of a physical optical model and an empirical resist model. The resist model compensates the optical model imprecision on top of modeling resist development. The optical model imprecision may result from mask topography effects and real mask information including mask ebeam writing and mask process contributions. For advanced technology nodes, significant progress has been made to model mask topography to improve optical model accuracy. However, mask information is difficult to decorrelate from standard OPC model. Our goal is to establish an accurate mask model through a dedicated calibration exercise. In this paper, we present a flow to calibrate an accurate mask enabling its implementation. The study covers the different effects that should be embedded in the mask model as well as the experiment required to model them.

  11. Informational masking and musical training.

    PubMed

    Oxenham, Andrew J; Fligor, Brian J; Mason, Christine R; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  12. Informational masking and musical training

    NASA Astrophysics Data System (ADS)

    Oxenham, Andrew J.; Fligor, Brian J.; Mason, Christine R.; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  13. Psychometric functions for informational masking

    NASA Astrophysics Data System (ADS)

    Lutfi, Robert A.; Kistler, Doris J.; Callahan, Michael R.; Wightman, Frederic L.

    2003-12-01

    The term informational masking has traditionally been used to refer to elevations in signal threshold resulting from masker uncertainty. In the present study, the method of constant stimuli was used to obtain complete psychometric functions (PFs) from 44 normal-hearing listeners in conditions known to produce varying amounts of informational masking. The listener's task was to detect a pure-tone signal in the presence of a broadband noise masker (low masker uncertainty) and in the presence of multitone maskers with frequencies and amplitudes that varied at random from one presentation to the next (high masker uncertainty). Relative to the broadband noise condition, significant reductions were observed in both the slope and the upper asymptote of the PF for multitone maskers producing large amounts of informational masking. Slope was affected more for some listeners and conditions while asymptote was affected more for others; consequently, neither parameter alone was highly predictive of individual thresholds or the amount of informational masking. Mean slopes and asymptotes varied nonmonotonically with the number of masker components in a manner similar to mean thresholds, particularly when the estimated effect of energetic masking on thresholds was subtracted out. As in past studies, the threshold data were well described by a model in which trial-by-trial judgments are based on a weighted sum of levels in dB at the output of independent auditory filters. The psychometric data, however, complicated the model's interpretation in two ways: First, they suggested that, depending on the listener and condition, the weights can either reflect a fixed influence of masker components on each trial or the effect of occasionally mistaking a masker component for the signal from trial to trial. Second, they indicated that in either case the variance of the underlying decision variable as estimated from PF slope is not by itself great enough to account for the observed changes

  14. Production mask composition checking flow

    NASA Astrophysics Data System (ADS)

    Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Wang, Alice; Lin, Roger; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2016-05-01

    The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations including writing, etching, metrology, etc. There still exist many potential errors that could occur when the frame, main circuit and dummies all together form a whole reticle. The MDCC flow combines the design rule check (DRC) and MRC concepts to adapt to the complex patterns in today's wafer production technologies. Although photomask data has unique characteristics, the MRC tool in Calibre® MDP can easily achieve mask composition by using the Extended MEBES job deck (EJB) format. In EJB format, we can customize the combination of any input layers in an IC design layout format, such as OASIS. Calibre MDP provides section-based processing for many standard verification rule format (SVRF) commands that support DRC-like checks on mask data. Integrating DRC-like checking with EJB for layer composition, we actually perform reticle-level DRC, which is the essence of MDCC. The flow also provides an early review environment before the photomask pattern files are available. Furthermore, to incorporate the MDCC in our production flow, runtime is one of the most important indexes we consider. When the MDCC is included in the tape-out flow, the runtime impact is very limited. Calibre, with its multi-threaded processes and good scalability, is the key to achieving acceptable runtime. In this paper, we present real case runtime data for 28nm and 14nm technology nodes, and prove the practicability of placing MDCC into mass production.

  15. Observation of a helium ion energy threshold for retention in tungsten exposed to hydrogen/helium mixture plasma

    NASA Astrophysics Data System (ADS)

    Thompson, M.; Deslandes, A.; Morgan, T. W.; Elliman, R. G.; De Temmerman, G.; Kluth, P.; Riley, D.; Corr, C. S.

    2016-10-01

    Helium retention is measured in tungsten samples exposed to mixed H/He plasma in the Magnum-PSI linear plasma device. It is observed that there is very little He retention below helium ion impact energies of 9.0+/- 1.4 eV, indicating the existence of a potential barrier which must be overcome for implantation to occur. The helium retention in samples exposed to plasma at temperatures  >1000 K is strongly correlated with nano-bubble formation measured using grazing incidence small-angle x-ray scattering. The diameters of nano-bubbles were not found to increase with increasing helium concentration, indicating that additional helium must be accommodated by increasing the bubble concentration or an increase in bubble pressure. For some samples pre-irradiation with heavy ions of 2.0 MeV energy is investigated to simulate the effects of neutron damage. It is observed that nano-bubble sizes are comparable between samples pre-irradiated with heavy-ions, and those without heavy-ion pre-irradiation.

  16. [Hearing implants].

    PubMed

    Stokroos, Robert J; George, Erwin L J

    2013-01-01

    In the Netherlands, more than 1.5 million people suffer from sensorineural hearing loss or deafness. However, fitting conventional hearing aids does not provide a solution for everyone. In recent decades, developments in medical technology have produced implantable and other devices that restore both sensorineural and conductive hearing losses. These hearing devices can be categorized into bone conductive devices, implantable middle ear prostheses, cochlear implants and auditory brainstem implants. Furthermore, new implants aimed at treating tinnitus and loss of vestibular function have recently been developed.

  17. Helium cryopumping for fusion applications

    SciTech Connect

    Sedgley, D.W.; Batzer, T.H.; Call, W.R.

    1988-05-01

    Large quantities of helium and hydrogen isotopes will be exhausted continuously from fusion power reactors. This paper summarizes two development programs undertaken to address vacuum pumping for this application: (i) A continuous duty cryopump for pumping helium and/or hydrogen species using charcoal sorbent and (ii) a cryopump configuration with an alternative shielding arrangement using charcoal sorbent or argon spray. A test program evaluated automatic pumping of helium, helium pumping by charcoal cryosorption and with argon spray, and cryosorption of helium/hydrogen mixtures. The continuous duty cryopump pumped helium continuously and conveniently. Helium pumping speed was 7.7 l/s/cm/sup 2/ of charcoal, compared to 5.8 l/s/cm/sup 2/ for the alternative pump. Helium speed using argon spray was 18% of that obtained by charcoal cryosorption in the same (W-panel) pump. During continuous duty cryopump mixture tests with helium and hydrogen copumped on charcoal, gas was released sporadically. Testing was insufficient to explain this unacceptable event.

  18. Helium jet dispersion to atmosphere

    NASA Technical Reports Server (NTRS)

    Khan, Hasna J.

    1986-01-01

    On the event of loss of vacuum guard of superinsulated helium dewar, high rate of heat transfer into the tank occurs. The rapid boiling of liquid helium causes the burst disk to rupture at four atmospheres and consequently the helium passes to the atmosphere through vent lines. The gaseous helium forms a vertical buoyant jet as it exits the vent line into a stagnant environment. Characterization of the gaseous jet is achieved by detailed analysis of the axial and radial dependence of the flow parameters.

  19. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  20. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  1. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2014) (a)...

  2. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  3. 48 CFR 52.208-8 - Required Sources for Helium and Helium Usage Data.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... Helium and Helium Usage Data. 52.208-8 Section 52.208-8 Federal Acquisition Regulations System FEDERAL... Provisions and Clauses 52.208-8 Required Sources for Helium and Helium Usage Data. As prescribed in 8.505, insert the following clause: Required Sources for Helium and Helium Usage Data (APR 2002) (a)...

  4. Multiple-mask chemical etching

    NASA Technical Reports Server (NTRS)

    Cannon, D. L.

    1969-01-01

    Multiple masking techniques use lateral etching to reduce the total area of the high etch-rate oxide exposed to the chemical etchant. One method uses a short-term etch to remove the top layer from the silicon oxide surface, another acts before the top layer is grown.

  5. Process optimization for mask fabrication

    NASA Astrophysics Data System (ADS)

    Sakurai, Hideaki; Itoh, Masamitsu; Kumagae, Akitoshi; Anze, Hirohito; Abe, Takayuki; Higashikawa, Iwao

    1998-09-01

    Recently, next-generation mask fabrication processes have been actively examined for application with Electron Beam writing tools and chemically amplified resists. In this study, we used a variable shaped electron beam writing system with an accelerating voltage and chemically amplified resist to investigate the dependence of the CD error in a localized area of a 6025 mask on the process factors, with the goal of fabricating more accurate masks with improving sensitivity. Our results indicated that CD error in a localized area did not depend on the resist thickness. Higher sensitivity and CD uniformity were achieved simultaneously. Moreover, we could isolate the CD error caused by the resist heating effect is more apparent for higher doses than lower doses. However, a higher dose gives rise to a small CD change rate. In this experiment, the effect of the lower CD change rate at a higher dose counterbalances the resist heating effect. By decreasing CD error in a localized area, we obtained a CD uniformity of 14 nm in a 100 mm area on the mask.

  6. Liquid Helium Acoustic Microscope.

    NASA Astrophysics Data System (ADS)

    Steer, Andrew Paul

    Available from UMI in association with The British Library. In an acoustic microscope, images are generated by monitoring the intensity of the ultrasonic reflection, or echo, from the surface of a sample. In order to achieve this a pulse of acoustic energy is produced by the excitation of a thin film transducer. The pulse thus generated propagates through a crystal and is incident upon the acoustic lens surface, which is the boundary between the crystal and an acoustic coupling liquid. The acoustic lens is a converging element, and brings the ultrasonic beam to a focus within the liquid. A sample, placed at the focus, can act as a reflector, and the returned pulse then contains information regarding the acoustic reflectivity of this specimen. Acoustic pulses are repeatedly launched and detected while the acoustic lens is scanned over the surface of the sample. In this manner an acoustic image is constructed. Acoustic losses in room temperature liquid coupling media represent a considerable source of difficulty in the recovery of acoustic echo signals. At the frequencies of operation required in a microscope which is capable of high resolution, the ultrasonic attenuation is not only large but increases with the square of frequency. In superfluid liquid helium at temperatures below 0.1 K, however, the ultrasonic attenuation becomes negligible. Furthermore, the low sound velocity in liquid helium results in an increase in resolution, since the acoustic wavelength is proportional to velocity. A liquid helium acoustic microscope has been designed and constructed. Details of the various possible detection methods are given, and comparisons are made between them. Measurements of the performance of the system that was adopted are reported. The development of a cooled preamplifier is also described. The variation of reflected signal with object distance has been measured and compared with theoretical predictions. This variation is important in the analysis of acoustic

  7. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    ERIC Educational Resources Information Center

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  8. Vertical Feature Mask Feature Classification Flag Extraction

    Atmospheric Science Data Center

    2013-03-28

      Vertical Feature Mask Feature Classification Flag Extraction This routine demonstrates extraction of the ... in a CALIPSO Lidar Level 2 Vertical Feature Mask feature classification flag value. It is written in Interactive Data Language (IDL) ...

  9. Physiological functioning of the ear and masking

    NASA Technical Reports Server (NTRS)

    1984-01-01

    The physiological functions of the ear and the role masking plays in speech communication are examined. Topics under investigation include sound analysis of the ear, the aural reflex, and various types of noise masking.

  10. Helium dilution refrigeration system

    DOEpatents

    Roach, Patrick R.; Gray, Kenneth E.

    1988-01-01

    A helium dilution refrigeration system operable over a limited time period, and recyclable for a next period of operation. The refrigeration system is compact with a self-contained pumping system and heaters for operation of the system. A mixing chamber contains .sup.3 He and .sup.4 He liquids which are precooled by a coupled container containing .sup.3 He liquid, enabling the phase separation of a .sup.3 He rich liquid phase from a dilute .sup.3 He-.sup.4 He liquid phase which leads to the final stage of a dilution cooling process for obtaining low temperatures. The mixing chamber and a still are coupled by a fluid line and are maintained at substantially the same level with the still cross sectional area being smaller than that of the mixing chamber. This configuration provides maximum cooling power and efficiency by the cooling period ending when the .sup.3 He liquid is depleted from the mixing chamber with the mixing chamber nearly empty of liquid helium, thus avoiding unnecessary and inefficient cooling of a large amount of the dilute .sup.3 He-.sup.4 He liquid phase.

  11. Helium dilution refrigeration system

    DOEpatents

    Roach, P.R.; Gray, K.E.

    1988-09-13

    A helium dilution refrigeration system operable over a limited time period, and recyclable for a next period of operation is disclosed. The refrigeration system is compact with a self-contained pumping system and heaters for operation of the system. A mixing chamber contains [sup 3]He and [sup 4]He liquids which are precooled by a coupled container containing [sup 3]He liquid, enabling the phase separation of a [sup 3]He rich liquid phase from a dilute [sup 3]He-[sup 4]He liquid phase which leads to the final stage of a dilution cooling process for obtaining low temperatures. The mixing chamber and a still are coupled by a fluid line and are maintained at substantially the same level with the still cross sectional area being smaller than that of the mixing chamber. This configuration provides maximum cooling power and efficiency by the cooling period ending when the [sup 3]He liquid is depleted from the mixing chamber with the mixing chamber nearly empty of liquid helium, thus avoiding unnecessary and inefficient cooling of a large amount of the dilute [sup 3]He-[sup 4]He liquid phase. 2 figs.

  12. Method for mask repair using defect compensation

    DOEpatents

    Sweeney, Donald W.; Ray-Chaudhuri, Avijit K.

    2001-01-01

    A method for repair of amplitude and/or phase defects in lithographic masks. The method involves modifying or altering a portion of the absorber pattern on the surface of the mask blank proximate to the mask defect to compensate for the local disturbance (amplitude or phase) of the optical field due to the defect.

  13. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  14. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a...

  15. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  16. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a...

  17. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  18. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  19. 21 CFR 868.5600 - Venturi mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Venturi mask. 868.5600 Section 868.5600 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5600 Venturi mask. (a) Identification. A venturi mask is...

  20. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a...

  1. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a...

  2. 21 CFR 868.5580 - Oxygen mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a...

  3. Mask qualification strategies in a wafer fab

    NASA Astrophysics Data System (ADS)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  4. Object Substitution Masking Induced by Illusory Masks: Evidence for Higher Object-Level Locus of Interference

    ERIC Educational Resources Information Center

    Hirose, Nobuyuki; Osaka, Naoyuki

    2009-01-01

    A briefly presented target can be rendered invisible by a lingering sparse mask that does not even touch it. This form of visual backward masking, called object substitution masking, is thought to occur at the object level of processing. However, it remains unclear whether object-level interference alone produces substitution masking because…

  5. Implantable Microimagers

    PubMed Central

    Ng, David C.; Tokuda, Takashi; Shiosaka, Sadao; Tano, Yasuo; Ohta, Jun

    2008-01-01

    Implantable devices such as cardiac pacemakers, drug-delivery systems, and defibrillators have had a tremendous impact on the quality of live for many disabled people. To date, many devices have been developed for implantation into various parts of the human body. In this paper, we focus on devices implanted in the head. In particular, we describe the technologies necessary to create implantable microimagers. Design, fabrication, and implementation issues are discussed vis-à-vis two examples of implantable microimagers; the retinal prosthesis and in vivo neuro-microimager. Testing of these devices in animals verify the use of the microimagers in the implanted state. We believe that further advancement of these devices will lead to the development of a new method for medical and scientific applications.

  6. Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

    NASA Astrophysics Data System (ADS)

    Mangat, Pawitter; Verduijn, Erik; Wood, Obert R.; Benk, Markus P.; Wojdyla, Antoine; Goldberg, Kenneth A.

    2015-07-01

    Despite significant enhancements in defect detection using optical and e-beam methodology, the smaller length scales and increasing challenges of future technology nodes motivate ongoing research into the need and associated cost of actinic inspection for EUV masks. This paper reports an extensive study of two EUV patterned masks, wherein the mask blank defectivity was characterized using optical (mask and wafer) methods and bright-field mask imaging (using the SHARP actinic microscope) of previously identified blank defects. We find that the bright field actinic imaging tool microscope captures and images many defects that are not seen by the automated optical inspection of patterned masks and printed wafers. In addition, actinic review reveals the impact of multilayer damage and depicts the printability profile which can be used as an added metric to define the patterned mask repair and defect compensation strategies.

  7. Simulation of Helium-3 Extraction from Lunar Ilmenite

    NASA Technical Reports Server (NTRS)

    Kuhlman, K. R.; Kulcinski, G. L.; Schmitt, H. H.

    2004-01-01

    Knowledge of the trapping mechanisms and diffusion characteristics of solar-wind implanted isotopes in the minerals of the lunar regolith will enable the optimization of the processes to extract solar wind gases from regolith particles. Extraction parameters include the temperature and duration of extraction, particle size, and gas yield. Diffusion data will increase the efficiency and profitability of future mining ventures. This data will also assist in optimizing the evaluations of various potential mining sites based on remote sensing data. For instance, if magnesian ilmenite (Mg,Fel.,Ti03) is found to retain He better than stoichiometric ilmenite (FeTi03), remote sensing data for Mg could be considered in addition to Ti and maturity data. The context of the currently discussed work is the mining of helium-3 for potential use as a fuel for fusion energy generation. However, the potential resources deposited by the solar wind include hydrogen (and derived water), helium-4, nitrogen and carbon. Implantation experiments such as those performed for helium isotopes in ilmenite are important for the optimized extraction of these additional resources. These experiments can easily be reproduced for most elements or isotopes of interest.

  8. Improving vision by pupil masking.

    PubMed

    Bonaque-González, Sergio; Ríos-Rodríguez, Susana; López-Gil, Norberto

    2016-07-01

    We propose an alternative solution to improve visual quality by spatially modulating the amplitude of light passing into the eye (related to the eye's transmittance), in contrast to traditional correction of the wavefront phase (related to the local refractive power). Numerical simulations show that masking the aberrated areas at the pupil plane should enhance visual function, especially in highly aberrated eyes. This correction could be implemented in practice using customized contact or intraocular lenses. PMID:27446688

  9. Improving vision by pupil masking

    PubMed Central

    Bonaque-González, Sergio; Ríos-Rodríguez, Susana; López-Gil, Norberto

    2016-01-01

    We propose an alternative solution to improve visual quality by spatially modulating the amplitude of light passing into the eye (related to the eye's transmittance), in contrast to traditional correction of the wavefront phase (related to the local refractive power). Numerical simulations show that masking the aberrated areas at the pupil plane should enhance visual function, especially in highly aberrated eyes. This correction could be implemented in practice using customized contact or intraocular lenses. PMID:27446688

  10. Precision spectroscopy of Helium

    SciTech Connect

    Cancio, P.; Giusfredi, G.; Mazzotti, D.; De Natale, P.; De Mauro, C.; Krachmalnicoff, V.; Inguscio, M.

    2005-05-05

    Accurate Quantum-Electrodynamics (QED) tests of the simplest bound three body atomic system are performed by precise laser spectroscopic measurements in atomic Helium. In this paper, we present a review of measurements between triplet states at 1083 nm (23S-23P) and at 389 nm (23S-33P). In 4He, such data have been used to measure the fine structure of the triplet P levels and, then, to determine the fine structure constant when compared with equally accurate theoretical calculations. Moreover, the absolute frequencies of the optical transitions have been used for Lamb-shift determinations of the levels involved with unprecedented accuracy. Finally, determination of the He isotopes nuclear structure and, in particular, a measurement of the nuclear charge radius, are performed by using hyperfine structure and isotope-shift measurements.

  11. History and future of mask making

    NASA Astrophysics Data System (ADS)

    Levy, Ken L.

    1996-12-01

    The history of the mask industry has three main periods, which I call the Classical Period, the Dark Ages, and the Renaissance, by analogy with those periods in the history of Western Europe. During the Classical Period, people developed 1X masks and the technology to make them. In the Dark Ages, people exploited the equipment developed during the Classical Period to make 5X reduction reticle, ending the nobility of mask making. In today's Renaissance of mask making, a proliferation of mask types is requiring a rebirth of innovation and creativity. The Renaissance resembles the Classical Period: masks are once again strategic, and technological capability is once again the driver. Meanwhile, the mask industry is carrying forward the productivity and efficiency gains it achieved during the Dark Ages. We must create a new business and economic model to support these changes in the characteristics of the marketplace.

  12. Cortical correlate of pattern backward masking.

    PubMed Central

    Kovács, G; Vogels, R; Orban, G A

    1995-01-01

    The perception of a briefly presented shape is strongly impaired when it is followed by another pattern, a phenomenon called backward masking. We found that the vast majority of a sample of shape-selective neurons in the macaque inferior temporal cortex respond selectively to backward-masked shapes, although these shapes could not be discriminated by human and monkey subjects. However, this selective response was brief, since it was either interrupted by the mask or overridden by a response to the mask itself. We show that reliable discrimination of briefly presented shapes by single neurons depends on the temporal integration of the response. Presentation of the mask, however, reduces the number of spikes available for integration, explaining backward masking. These results also provide direct neurophysiological evidence for the "interruption theory" of backward masking. PMID:7777553

  13. Superfluid Helium Heat Pipe

    NASA Astrophysics Data System (ADS)

    Gully, P.

    This paper reports on the development and the thermal tests of three superfluid helium heat pipes. Two of them are designed to provide a large transport capacity (4 mW at 1.7 K). They feature a copper braid located inside a 6 mm outer diameter stainless tube fitted with copper ends for mechanical anchoring. The other heat pipe has no copper braid and is designed to get much smaller heat transport capacity (0.5 mW) and to explore lower temperature (0.7 - 1 K). The copper braid and the tube wall is the support of the Rollin superfluid helium film in which the heat is transferred. The low filling pressure makes the technology very simple with the possibility to easily bend the tube. We present the design and discuss the thermal performance of the heat pipes tested in the 0.7 to 2.0 K temperature range. The long heat pipe (1.2 m with copper braid) and the short one (0.25 m with copper braid) have similar thermal performance in the range 0.7 - 2.0 K. At 1.7 K the long heat pipe, 120 g in weight, reaches a heat transfer capacity of 6.2 mW and a thermal conductance of 600 mW/K for 4 mW transferred power. Due to the pressure drop of the vapor flow and Kapitza thermal resistance, the conductance of the third heat pipe dramatically decreases when the temperature decreases. A 3.8 mW/K is obtained at 0.7 K for 0.5 mW transferred power.

  14. Histrelin Implant

    MedlinePlus

    ... response to histrelin implant. Your blood sugar and glycosylated hemoglobin (HbA1c) should be checked regularly.Ask your pharmacist any questions you have about histrelin implant.It is important for you to keep a written list of all of the prescription and ...

  15. Comparative Study of Manufacturing Techniques for Coronagraphic Binary Pupil Masks: Masks on Substrates and Free-Standing Masks

    NASA Astrophysics Data System (ADS)

    Enya, Keigo; Haze, Kanae; Kotani, Takayuki; Abe, Lyu

    2012-12-01

    We present a comparative study of the manufacture of binary pupil masks for coronagraphic observations of exoplanets. A checkerboard mask design, a type of binary pupil mask design, was adopted, and identical patterns of the same size were used for all masks in order that we could compare the differences resulting from the different manufacturing methods. The masks on substrates had aluminum checkerboard patterns with thicknesses of 0.1/0.2/0.4/0.8/1.6μm, constructed on substrates of BK7 glass, silicon, and germanium using photolithography and chemical processes. Free-standing masks made of copper and nickel with thicknesses of 2/5/10/20μm were also realized using photolithography and chemical processes, which included careful release from the substrate used as an intermediate step in the manufacture. Coronagraphic experiments using a visible laser were carried out for all masks on BK7 glass substrate and the free-standing masks. The average contrasts were 8.4 × 10-8, 1.2 × 10-7, and 1.2 × 10-7 for the masks on BK7 substrates, the free-standing copper masks, and the free-standing nickel masks, respectively. No significant correlation was concluded between the contrast and the mask properties. The high-contrast masks have the potential to cover the needs of coronagraphs for both ground-based and space-borne telescopes over a wide wavelength range. Especially, their application to the infrared space telescope, SPICA, is appropriate.

  16. Resource Letter SH-1: Superfluid Helium.

    ERIC Educational Resources Information Center

    Hallock, Robert B.

    1982-01-01

    Provides an annotated list of books, textbooks, and films on superfluid helium. Also lists research reports/reviews arranged by category, including among others, early history, microscopic understanding, ions in helium, helium in rotation, vortices and quantization, helium films and constricted geometrics, persistence flow, and superfluid helium…

  17. Resistor monitors transfer of liquid helium

    NASA Technical Reports Server (NTRS)

    Hesketh, W. D.

    1966-01-01

    Large resistance change of a carbon resistor at the liquid helium temperature distinguishes between the transfer of liquid helium and gaseous helium into a closed Dewar. The resistor should be physically as small as possible to reduce the heat load to the helium.

  18. Helium-ion-induced release of hydrogen from graphite

    SciTech Connect

    Langley, R.A.

    1987-01-01

    The ion-induced release of hydrogen from AXF-5Q graphite was studied for 350-eV helium ions. The hydrogen was implanted into the graphite with a low energy (approx.200 eV) and to a high fluence. This achieved a thin (approx.10-nm), saturated near-surface region. The release of hydrogen was measured as a function of helium fluence. A model that includes ion-induced detrapping, retrapping, and surface recombination was used to analyze the experimental data. A value of (1.65 +- 0.2) x 10/sup -16/ cm/sup 2/ was obtained from the detrapping cross section, and a value of (0.5 to 4) x 10/sup -14/ cm/sup 4//atoms was obtained for the recombination coefficient. 11 refs., 4 figs.

  19. Low temperature uses of helium

    NASA Technical Reports Server (NTRS)

    Brown, G. V.

    1970-01-01

    Helium is used for purging and pressurizing cryogenic rocket propellants, welding, atmosphere control, leak detection, and refrigeration. It provides the lowest possible liquid-bath temperature and produces superconductivity in certain materials. Its superfluid effects are used in superconducting magnets.

  20. Interactions of mobile helium clusters with surfaces and grain boundaries of plasma-exposed tungsten

    SciTech Connect

    Hu, Lin; Maroudas, Dimitrios; Hammond, Karl D.; Wirth, Brian D.

    2014-05-07

    We report results of atomistic computations for the interactions of small mobile helium clusters (He{sub n}) with free surfaces and grain boundaries (GBs) in tungsten toward development of continuum drift-diffusion-reaction models for the dynamics of mobile helium clusters in plasma-exposed tungsten. Molecular-statics (MS) simulations based on reliable many-body interatomic potentials are carried out for He{sub n} (1 ≤ n ≤ 7) clusters near sinks to obtain the potential energy profiles of the He{sub n} clusters as a function of the clusters' center-of-mass distance from a sink. Sinks investigated include surfaces, GBs, and regions in the vicinity of junctions where GBs intersect free surfaces. Elastic interaction potentials based on elastic inclusion theory provide an excellent description of the MS results for the cluster-sink interactions. The key parameter in the elastic models is the sink segregation strength, which is found to increase with increasing cluster size. Such cluster-sink interactions are responsible for the migration of small helium clusters by drift and for helium segregation on surfaces and grain boundaries in tungsten. Such helium segregation on sinks is observed in large-scale molecular-dynamics simulations of helium aggregation in model polycrystalline tungsten at 933 K upon helium implantation.

  1. Radiation source for helium magnetometers

    NASA Technical Reports Server (NTRS)

    Slocum, Robert E. (Inventor)

    1991-01-01

    A radiation source (12) for optical magnetometers (10) which use helium isotopes as the resonance element (30) includes an electronically pumped semiconductor laser (12) which produces a single narrow line of radiation which is frequency stabilized to the center frequency of the helium resonance line to be optically pumped. The frequency stabilization is accomplished using electronic feedback (34, 40, 42, 44) to control a current sources (20) thus eliminating the need for mechanical frequency tuning.

  2. Polarization masks: concept and initial assessment

    NASA Astrophysics Data System (ADS)

    Lam, Michael; Neureuther, Andrew R.

    2002-07-01

    Polarization from photomasks can be used as a new lever to improve lithographic performance in both binary and phase-shifting masks (PSMs). While PSMs manipulate the phase of light to control the temporal addition of electric field vectors, polarization masks manipulate the vector direction of electric field vectors to control the spatial addition of electric field components. This paper explores the theoretical possibilities of polarization masks, showing that it is possible to use bar structures within openings on the mask itself to polarize incident radiation. Rigorous electromagnetic scattering simulations using TEMPEST and imaging with SPLAT are used to give an initial assessment on the functionality of polarization masks, discussing the polarization quality and throughputs achieved with the masks. Openings between 1/8 and 1/3 of a wavelength provide both a low polarization ratio and good transmission. A final overall throughput of 33% - 40% is achievable, corresponding to a dose hit of 2.5x - 3x.

  3. Repairing native defects on EUV mask blanks

    NASA Astrophysics Data System (ADS)

    Lawliss, Mark; Gallagher, Emily; Hibbs, Michael; Seki, Kazunori; Isogawa, Takeshi; Robinson, Tod; LeClaire, Jeff

    2014-10-01

    Mask defectivity is a serious problem for all lithographic masks, but especially for EUV masks. Defects in the EUV blank are particularly challenging because their elimination is beyond control of the mask fab. If defects have been identified on a mask blank, patterns can be shifted to place as many blank defects as possible in regions where printing impact will be eliminated or become unimportant. For those defects that cannot be mitigated through pattern shift, repair strategies must be developed. Repairing defects that occur naturally in the EUV blank is challenging because the printability of these defects varies widely. This paper describes some types of native defects commonly found and begins to outline a triage strategy for defects that are identified on the blank. Sample defects best suited to nanomachining repair are treated in detail: repairs are attempted, characterized using mask metrology and then tested for printability. Based on the initial results, the viability of repairing EUV blank native defects is discussed.

  4. Semiconductor technology trend and requirements for masks

    NASA Astrophysics Data System (ADS)

    Komiya, Hiroyoshi

    1999-08-01

    The fabrication cost of the semiconductor device is increasing because the fabrication cost per wafer unit area and the mask cost are increasing rapidly with the design rule decreased. The rapid increase in the mask cost will influence the semiconductor industry growth. The progress in the lithography, including the mask, is the key issue for the progress in the entire semiconductor technology beyond 180 nm design rule, because the mask is indispensable for any types of lithography, and is regarded as one of the most critical technologies, both in resolution and productivity. To continue the progress in the entire semiconductor technology and the growth of the semiconductor business, it is indispensable to make challenges in the low cost and high precision mask technology under the cooperation with related industries and academia. It is especially important to develop the cost optimum solution for the total lithography technology including masks.

  5. Development of mask-DFM system MiLE load estimation of mask manufacturing

    NASA Astrophysics Data System (ADS)

    Nagamura, Yoshikazu; Hosono, Kunihiro; Narukawa, Shogo; Mohri, Hiroshi; Hayashi, Naoya; Kato, Masahiro; Kawase, Hidemichi

    2007-10-01

    Load of photomask manufacturing for the most advanced semiconductor devices is increasing due to the complexity of mask layouts caused by highly accurate RET or OPC, tight specification for 2D/3D mask structures, and requirements of quick deliveries. The mask cost becomes a concern of mask users especially in SoC businesses because the number of masks required throughout the wafer process is almost the same for each product regardless of the variety in production volume when a unified platform is applied to the designs. Shares of mask cost within total production cost cannot be ignored especially in small volume SoC products. DFM (design for manufacturing) is inevitable in a mask level as well as in a wafer level to solve the cost problem. "Mask-DFM" is a method to decrease the burden of mask manufacturing and to improve the yield and quality of masks, not only by modification of mask pattern layouts (design) but also all other things including utilization of designer's intents. We have developed our Mask-DFM system called "MiLE", that calculates mask-manufacturing workload through layout analyses combining information of mask configuration, and visualizes the consequence of Mask-DFM efforts. "MiLE (Mask manufacturIng Load Estimation)" calculates a relative index which represents the mask manufacturing workload determined by factors of 1) EB writing, 2) defect inspection/repair, 3) materials and processes and 4) specification. All the factors are computed before tape-outs for mask making in the system by the following methods. To estimate EB writing time, we applied high-throughput simulator and counted the number of "shot", minimum figure unit in EB writing, by using post-OPC layout data. Mask layout that caused troubles and extra load in mask inspection or repair was specified from MRC (mask rule checking) of the same post-OPC data. Additional layout analysis perceives designer's intents that are described in the layout data and these are reflected in the

  6. Polyurethane Masks Large Areas in Electroplating

    NASA Technical Reports Server (NTRS)

    Beasley, J. L.

    1985-01-01

    Polyurethane foam provides effective mask in electroplating of copper or nickel. Thin layer of Turco maskant painted on area to be masked: Layer ensures polyurethane foam removed easily after served its purpose. Component A, isocyanate, and component B, polyol, mixed together and brushed or sprayed on mask area. Mixture reacts, yielding polyurethane foam. Foam prevents deposition of nickel or copper on covered area. New method saves time, increases productivity and uses less material than older procedures.

  7. Cochlear implant

    MedlinePlus

    ... implant. These specialists may include: Audiologists Speech therapists Ear, nose, and throat doctors (otolaryngologists) This is a very important part of the process. You will need to work closely with your team of specialists to get ...

  8. Cochlear Implants

    MedlinePlus

    ... additional visits are needed for activating, adjusting, and programming the various electrodes that have been implanted. Also, ... to the center for checkups once the final programming is made to the speech processor. Both children ...

  9. Method of making low leakage N-channel SOS transistors utilizing positive photoresist masking techniques

    NASA Technical Reports Server (NTRS)

    Policastro, Steven G. (Inventor); Woo, Dae-Shik (Inventor)

    1983-01-01

    A self-aligned method of implanting the edges of NMOS/SOS transistors is described. The method entails covering the silicon islands with a thick oxide layer, applying a protective photoresist layer over the thick oxide layer, and exposing the photoresist layer from the underside of the sapphire substrate thereby using the island as an exposure mask. Only the photoresist on the islands' edges will be exposed. The exposed photoresist is then removed and the thick oxide is removed from the islands edges which are then implanted.

  10. VIIRS Cloud Mask Validation Exercises

    NASA Astrophysics Data System (ADS)

    Frey, R.; Heidinger, A. K.; Hutchison, K.; Dutcher, S.

    2011-12-01

    The NPP Satellite is scheduled for launch October 25, 2011. Included on the platform is the VIIRS (Visible/Infrared Imager/Suite) instrument which features 16 bands at about 0.75 m spatial resolution and 5 imager bands at roughly 0.375 m resolution. The basic VIIRS cloud mask (VCM) output is a flag that indicates one of four possible cloudy vs. clear conditions for each 0.75 m pixel: confident clear, probably clear, probably cloudy, and confident cloudy. Pre-launch assessment of the VCM algorithm has been performed with use of MODIS observations as proxy input. Several comparisons are shown between VCM results and cloud detection from other instruments and/or algorithms: MODIS cloud mask (MOD35) at the five-minute granule level (L2), global and regional monthly average cloud amounts from MODIS (MOD35) and MODIS-CERES, ISCCP, PATMOS-x (AVHRR), and CALIOP (lidar). In addition to overall results, collocated MODIS observations, CALIOP and VCM cloud determinations are used to evaluate VCM cloud test thresholds and other tunable parameters. The methods shown will be among those used during the Intensive Calibration and Validation period and beyond.

  11. X-ray lithography masking

    NASA Technical Reports Server (NTRS)

    Smith, Henry I. (Inventor); Lim, Michael (Inventor); Carter, James (Inventor); Schattenburg, Mark (Inventor)

    1998-01-01

    X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

  12. Mask lithography for display manufacturing

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Ekberg, P.

    2010-05-01

    The last ten years have seen flat displays conquer our briefcases, desktops, and living rooms. There has been an enormous development in production technology, not least in lithography and photomasks. Current masks for large displays are more than 2 m2 and make 4-6 1X prints on glass substrates that are 9 m2. One of the most challenging aspects of photomasks for displays is the so called mura, stripes or blemishes which cause visible defects in the finished display. For the future new and even tighter maskwriter specifications are driven by faster transistors and more complex pixel layouts made necessary by the market's wish for still better image quality, multi-touch panels, 3D TVs, and the next wave of e-book readers. Large OLED screens will pose new challenges. Many new types of displays will be lowcost and use simple lithography, but anything which can show video and high quality photographic images needs a transistor backplane and sophisticated masks for its production.

  13. Evaluation of a native vegetation masking technique

    NASA Technical Reports Server (NTRS)

    Kinsler, M. C.

    1984-01-01

    A crop masking technique based on Ashburn's vegetative index (AVI) was used to evaluate native vegetation as an indicator of crop moisture condition. A mask of the range areas (native vegetation) was generated for each of thirteen Great Plains LANDSAT MSS sample segments. These masks were compared to the digitized ground truth and accuracies were computed. An analysis of the types of errors indicates a consistency in errors among the segments. The mask represents a simple quick-look technique for evaluating vegetative cover.

  14. Computational defect review for actinic mask inspections

    NASA Astrophysics Data System (ADS)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram

    2013-04-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The limitation of 1.35 NA posed by water-based lithography has led to the application of various resolution enhancement techniques (RET), for example, use of strong phase-shifting masks, aggressive OPC and sub-resolution assist features, customized illuminators, etc. The adoption of these RET techniques combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for a mask inspection engineer. Inspecting masks under their actinic-aerial image conditions would detect defects that are more likely to print under those exposure conditions. However, this also makes reviewing such defects in their low-contrast aerial images very challenging. On the other hand, inspecting masks under higher resolution inspection optics would allow for better viewing of defects post-inspection. However, such inspections generally would also detect many more defects, including printable and nuisance, thereby making it difficult to judge which are of real concern for printability on wafer. Often, an inspection engineer may choose to use Aerial and/or high resolution inspection modes depending on where in the process flow the mask is and the specific device-layer characteristics of the mask. Hence, a comprehensive approach is needed in handling defects both post-aerial and post-high resolution inspections. This analysis system is designed for the Applied Materials Aera™ mask inspection platform, all data reported was collected using the Aera.

  15. Crystal orientation effects on helium ion depth distributions and adatom formation processes in plasma-facing tungsten

    SciTech Connect

    Hammond, Karl D.; Wirth, Brian D.

    2014-10-14

    We present atomistic simulations that show the effect of surface orientation on helium depth distributions and surface feature formation as a result of low-energy helium plasma exposure. We find a pronounced effect of surface orientation on the initial depth of implanted helium ions, as well as a difference in reflection and helium retention across different surface orientations. Our results indicate that single helium interstitials are sufficient to induce the formation of adatom/substitutional helium pairs under certain highly corrugated tungsten surfaces, such as (1 1 1)-orientations, leading to the formation of a relatively concentrated layer of immobile helium immediately below the surface. The energies involved for helium-induced adatom formation on (1 1 1) and (2 1 1) surfaces are exoergic for even a single adatom very close to the surface, while (0 0 1) and (0 1 1) surfaces require two or even three helium atoms in a cluster before a substitutional helium cluster and adatom will form with reasonable probability. This phenomenon results in much higher initial helium retention during helium plasma exposure to (1 1 1) and (2 1 1) tungsten surfaces than is observed for (0 0 1) or (0 1 1) surfaces and is much higher than can be attributed to differences in the initial depth distributions alone. The layer thus formed may serve as nucleation sites for further bubble formation and growth or as a source of material embrittlement or fatigue, which may have implications for the formation of tungsten “fuzz” in plasma-facing divertors for magnetic-confinement nuclear fusion reactors and/or the lifetime of such divertors.

  16. A cluster randomised trial of cloth masks compared with medical masks in healthcare workers

    PubMed Central

    MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi

    2015-01-01

    Objective The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. Setting 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. Participants 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Intervention Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Main outcome measure Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. Results The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. Conclusions This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Trial registration number Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. PMID

  17. Contraceptive implants.

    PubMed

    McDonald-Mosley, Raegan; Burke, Anne E

    2010-03-01

    Implantable contraception has been extensively used worldwide. Implants are one of the most effective and reversible methods of contraception available. These devices may be particularly appropriate for certain populations of women, including women who cannot use estrogen-containing contraception. Implants are safe for use by women with many chronic medical problems. The newest implant, Implanon (Organon International, Oss, The Netherlands), is the only device currently available in the United States and was approved in 2006. It is registered for 3 years of pregnancy prevention. Contraceptive implants have failure rates similar to tubal ligation, and yet they are readily reversible with a return to fertility within days of removal. Moreover, these contraceptive devices can be safely placed in the immediate postpartum period, ensuring good contraceptive coverage for women who may be at risk for an unintended pregnancy. Irregular bleeding is a common side effect for all progestin-only contraceptive implants. Preinsertion counseling should address possible side effects, and treatment may be offered to women who experience prolonged or frequent bleeding.

  18. Set Size and Mask Duration Do Not Interact in Object-Substitution Masking

    ERIC Educational Resources Information Center

    Argyropoulos, Ioannis; Gellatly, Angus; Pilling, Michael; Carter, Wakefield

    2013-01-01

    Object-substitution masking (OSM) occurs when a mask, such as four dots that surround a brief target item, onsets simultaneously with the target and offsets a short time after the target, rather than simultaneously with it. OSM is a reduction in accuracy of reporting the target with the temporally trailing mask, compared with the simultaneously…

  19. Design and development of a helium injection system to improve external leakage detection during liquid nitrogen immersion tests

    NASA Astrophysics Data System (ADS)

    Townsend, Andrew; Mishra, Rakesh

    2016-10-01

    The testing of assemblies for use in cryogenic systems commonly includes evaluation at or near operating (therefore cryogenic) temperature. Typical assemblies include valves and pumps for use in liquid oxygen-liquid hydrogen rocket engines. One frequently specified method of cryogenic external leakage testing requires the assembly, pressurized with gaseous helium (GHe), be immersed in a bath of liquid nitrogen (LN2) and allowed to thermally stabilize. Component interfaces are then visually inspected for leakage (bubbles). Unfortunately the liquid nitrogen will be boiling under normal, bench-top, test conditions. This boiling tends to mask even significant leakage. One little known and perhaps under-utilized property of helium is the seemingly counter-intuitive thermodynamic property that when ambient temperature helium is bubbled through boiling LN2 at a temperature of -195.8 °C, the temperature of the liquid nitrogen will reduce. This paper reports on the design and testing of a novel proof-of-concept helium injection control system confirming that it is possible to reduce the temperature of an LN2 bath below boiling point through the controlled injection of ambient temperature gaseous helium and then to efficiently maintain a reduced helium flow rate to maintain a stabilized liquid temperature, enabling clear visual observation of components immersed within the LN2. Helium saturation testing is performed and injection system sizing is discussed.

  20. IntenCD and mask phase uniformity

    NASA Astrophysics Data System (ADS)

    Cohen, Yaron; Mangan, Shmoolik; Attal, Shay; Ben-Yishay, Michael; Englard, Ilan

    2010-09-01

    The allowable wafer Critical Dimension Uniformity (CDU) budget of the 2x node poses stringent requirements on mask induced errors at wafer level. The total CDU budget of 2 nm which is partially consumed by across wafer and field process and imaging variations, leaves little room for additional mask errors to still comply to the overall CDU budget. The trend of higher mask error enhancement factor (MEEF) for advanced technology nodes aggravates this situation further. Traditionally, the assessment of these variations is based on separate critical dimension and phase/transmission measurements. Metrology measurement tools are typically based on different techniques to independently measure each source of non-uniformity and produce the required uniformity maps. Each technique concentrates on a single physical property (e.g., line-width, phase, transmission, etc.) and requires special calibration for the required accuracy, precision and its transformation from mask to the wafer nanometer domain. An alternative to all these separate measurements is proposed by using the IntenCDTM application based on the aerial image of the mask. This alternative approach provides a map of mask-induced, printed CD variations across the photomask. In this paper, a study is presented to estimate mask-induced printed CDU at wafer level from the aerial image and results are compared to mask- and phase-CD measurements. The work shows that a single aerial IntenCD map can replace the two sets of data based on mask-CD and mask-phase measurements and allows for prediction of the mask contribution to overall printed CDU.

  1. Fast mask writers: technology options and considerations

    NASA Astrophysics Data System (ADS)

    Litt, Lloyd C.; Groves, Timothy; Hughes, Greg

    2011-04-01

    The semiconductor industry is under constant pressure to reduce production costs even as the complexity of technology increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which have added to the complexity of making masks because of the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low-k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that funding on the order of 50M to 90M for non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development poses a high risk for an individual supplier. The structure of the mask fabrication marketplace separates the mask writer equipment customer (the mask supplier) from the final customer (wafer manufacturer) that will be most effected by the increase in mask cost that will result if a high speed mask writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed.

  2. Shadows Alter Facial Expressions of Noh Masks

    PubMed Central

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  3. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    NASA Astrophysics Data System (ADS)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  4. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  5. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 1 2014-10-01 2014-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  6. 42 CFR 84.117 - Gas mask containers; minimum requirements.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas mask containers; minimum requirements. 84.117... § 84.117 Gas mask containers; minimum requirements. (a) Gas masks shall be equipped with a substantial... mask it contains and all appropriate approval labels. (b) Containers for gas masks shall be...

  7. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas masks; description. 84.110 Section 84.110... HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.110 Gas masks; description. (a) Gas masks including all completely assembled air purifying masks designed...

  8. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 1 2014-10-01 2014-10-01 false Gas masks; description. 84.110 Section 84.110... HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.110 Gas masks; description. (a) Gas masks including all completely assembled air purifying masks designed...

  9. 42 CFR 84.110 - Gas masks; description.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas masks; description. 84.110 Section 84.110... HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.110 Gas masks; description. (a) Gas masks including all completely assembled air purifying masks designed...

  10. COSMIC-RAY HELIUM HARDENING

    SciTech Connect

    Ohira, Yutaka; Ioka, Kunihito

    2011-03-01

    Recent observations by the CREAM and ATIC-2 experiments suggest that (1) the spectrum of cosmic-ray (CR) helium is harder than that of CR protons below the knee energy, 10{sup 15}eV, and (2) all CR spectra become hard at {approx}>10{sup 11}eV nucleon{sup -1}. We propose a new idea, that higher energy CRs are generated in a more helium-rich region, to explain the hardening without introducing different sources for CR helium. The helium-to-proton ratio at {approx}100 TeV exceeds the Big Bang abundance Y = 0.25 by several times, and the different spectrum is not reproduced within the diffusive shock acceleration theory. We argue that CRs are produced in a chemically enriched region, such as a superbubble, and the outward-decreasing abundance naturally leads to the hard spectrum of CR helium if CRs escape from the supernova remnant shock in an energy-dependent way. We provide a simple analytical spectrum that also fits well the hardening due to the decreasing Mach number in the hot superbubble with {approx}10{sup 6} K. Our model predicts hard and concave spectra for heavier CR elements.

  11. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  12. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  13. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  14. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  15. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  16. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  17. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  18. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 8 2012-04-01 2012-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  19. 21 CFR 868.5590 - Scavenging mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Scavenging mask. 868.5590 Section 868.5590 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5590 Scavenging mask. (a) Identification....

  20. 21 CFR 868.5570 - Nonrebreathing mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Nonrebreathing mask. 868.5570 Section 868.5570 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5570 Nonrebreathing mask....

  1. Implicit Semantic Perception in Object Substitution Masking

    ERIC Educational Resources Information Center

    Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

    2011-01-01

    Decades of research on visual perception has uncovered many phenomena, such as binocular rivalry, backward masking, and the attentional blink, that reflect "failures of consciousness". Although stimuli do not reach awareness in these paradigms, there is evidence that they nevertheless undergo semantic processing. Object substitution masking (OSM),…

  2. Computing Challenges in Coded Mask Imaging

    NASA Technical Reports Server (NTRS)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  3. EUV mask defect mitigation through pattern placement

    NASA Astrophysics Data System (ADS)

    Burns, John; Abbas, Mansoor

    2010-09-01

    One of the challenges of EUVL is to bring EUV mask blank defect levels to zero. With uncertainty on when defect free masks may be routinely available, we explore a possibility for effectively using defective EUV mask blanks in production with a defect avoidance strategy. The key idea is to position the pattern/layout on the blank where the defects do not impact the final wafer image. Assuming that layout designs contain some non-critical areas in which defects can be safely positioned, it may be possible to align these regions with a given, small set of defect positions mapped from an imperfect mask blank. Using a few representative assortment of current-node, full-chip layout patterns we run multiple trials against real blank defect maps with various defect counts successfully. Our goal is to assess the probabilities that defect avoidance will work as a function of mask blank defect count, and by lithography layer.

  4. EUVL mask substrate specifications (wafer-type)

    SciTech Connect

    Tong, W

    1999-07-01

    The Extreme Ultraviolet Lithography (EUVL) program currently is constructing an alpha-class exposure tool known as the Engineering Test Stand (ETS) that will employ 200mm wafer format masks. This report lists and explains the current specifications for the EUVL mask substrates suitable for use on the ETS. The shape and size of the mask are the same as those of a standard 200mm Si wafer. The flatness requirements are driven by the potential image placement distortion caused by the non-telecentric illumination of EUVL. The defect requirements are driven by the printable-defect size and desired yield for mask blank fabrication. Surface roughness can cause both a loss of light throughput and image speckle. The EUVL mask substrate must be made of low-thermal-expansion material because 40% of the light is absorbed by the multilayers and causes some uncorrectable thermal distortion during printing.

  5. Counting Electrons on Liquid Helium

    NASA Astrophysics Data System (ADS)

    Glasson, Phillip

    2004-03-01

    Electrons on liquid helium, localised in an array of quantum dots, have been proposed as condensed matter qubits [M.I.Dykman et al. Phys.Rev. B 67, 155402 (2003)]. The ground and first excited Rydberg states in the vertical potential well on the helium surface would represent |0> and |1>. This requires (a) novel electronic devices on helium using microstructured substrates, (b) excitation of Rydberg states using millimetric microwaves and (c) detection of individual electrons and their quantum states. Progress in meeting these challenges will be presented. An AC-coupled Field Effect Transistor (FET) has been made on GaAs, using free electrons on suspended liquid helium microchannels, 16 micron wide and 1.6 microns deep [P.Glasson et al, Phys.Rev.Lett. 87 176802 (2001)]. The microwave absorption to the first excited Rydberg state near 200 GHz has been measured below 1 K [E.Collin et al. Phys.Rev.Lett. 89, 245301 (2002)], where the temperature-dependent contribution to the linewidth is small. High values of the ratio of the Rabi frequency to the linewidth are obtained. Electrons are trapped on a 5 micron diameter pool of superfluid helium, above a single-electron-transistor (SET) as a detector. The pool is charged from a surface electron reservoir and we count the electrons into and out of the trap. Individual electrons can be stored, detected and counted: the next stage is quantum state detection. The prospects for qubits and quantum information processing with electrons on helium will be assessed.

  6. Pulsed helium ionization detection system

    DOEpatents

    Ramsey, Roswitha S.; Todd, Richard A.

    1987-01-01

    A helium ionization detection system is provided which produces stable operation of a conventional helium ionization detector while providing improved sensitivity and linearity. Stability is improved by applying pulsed dc supply voltage across the ionization detector, thereby modifying the sampling of the detectors output current. A unique pulse generator is used to supply pulsed dc to the detector which has variable width and interval adjust features that allows up to 500 V to be applied in pulse widths ranging from about 150 nsec to about dc conditions.

  7. Pulsed helium ionization detection system

    DOEpatents

    Ramsey, R.S.; Todd, R.A.

    1985-04-09

    A helium ionization detection system is provided which produces stable operation of a conventional helium ionization detector while providing improved sensitivity and linearity. Stability is improved by applying pulsed dc supply voltage across the ionization detector, thereby modifying the sampling of the detectors output current. A unique pulse generator is used to supply pulsed dc to the detector which has variable width and interval adjust features that allows up to 500 V to be applied in pulse widths ranging from about 150 nsec to about dc conditions.

  8. Cheap Face Masks Little Help Against Air Pollutants

    MedlinePlus

    ... News) -- Inexpensive cloth masks offer little protection against air pollution, a new study suggests. Many people in Asia ... or washable cloth masks to protect against small air pollution particles. But tests on different types of masks ...

  9. Helium release during shale deformation: Experimental validation

    NASA Astrophysics Data System (ADS)

    Bauer, Stephen J.; Gardner, W. Payton; Heath, Jason E.

    2016-07-01

    This work describes initial experimental results of helium tracer release monitoring during deformation of shale. Naturally occurring radiogenic 4He is present in high concentration in most shales. During rock deformation, accumulated helium could be released as fractures are created and new transport pathways are created. We present the results of an experimental study in which confined reservoir shale samples, cored parallel and perpendicular to bedding, which were initially saturated with helium to simulate reservoir conditions, are subjected to triaxial compressive deformation. During the deformation experiment, differential stress, axial, and radial strains are systematically tracked. Release of helium is dynamically measured using a helium mass spectrometer leak detector. Helium released during deformation is observable at the laboratory scale and the release is tightly coupled to the shale deformation. These first measurements of dynamic helium release from rocks undergoing deformation show that helium provides information on the evolution of microstructure as a function of changes in stress and strain.

  10. Impact of photolithography and mask variability on interconnect parasitics

    NASA Astrophysics Data System (ADS)

    Tian, Yuxin; Shi, Weiping; Mercer, M. Ray

    2005-11-01

    Due to photolithography effects and manufacture process variations, the actual features printed on wafer are different from the designed ones. This difference results in the inaccuracy on parasitic extraction, which is critical for timing verification and design for manufacturability. Most of the current layout parasitic extraction (LPE) tools ignore these effects and can cause as high as 20% errors. This paper proposes a new strategy to extract interconnect parasitics with the consideration of photolithography effects and process variations. Based on the feedback from lithography simulation, a shape correction process is setup to adjust the interconnect structure for LPE tools. Compared with the traditional extraction methodology, the parasitics extracted from this adjusted geometry are more accurate. This method can be implanted into the current design flow with minimum change. Meanwhile, this paper studies the impacts of mask critical dimension (CD) variations on interconnect parasitics. The variability analysis is based on PROLITH lithography simulation software and is tested on RAPHAEL interconnect library. The results show a high nonlinear relationship between the mask variation and the interconnect parasitics.

  11. Helium and neon in lunar ilmenites of different antiquities

    NASA Technical Reports Server (NTRS)

    Nier, A. O.; Schlutter, D. J.

    1994-01-01

    Helium and neon were extracted from individual lunar ilmenite grains, approximately 100 micrometers in diameter, using a pulsed step-heating technique. Grains from lunar samples 71501 and 79035, believed to have been exposed to solar corpuscular radiation at greatly different times, were studied. The results found were consistent with the hypothesis that in addition to solar-wind-implanted gas, a second more deeply implanted component was present in both species of grains. Average isotopic ratios were determined giving equal weight to each of the particles. As found in depth studies employing chemical etching, both the He-3/He-4 and Ne-20/Ne-22 ratios were lower in the more deeply implanted gas than in the solar wind component. The He-3/He-4 ratio in the solar wind component of the more ancient grains was lower than that in the more recently exposed ones, whereas no difference was found for the more deeply embedded He. In the deeply embedded component of the ancient grains, the He-4/Ne-20 ratio was approx. 2x that found in the more recently exposed grains. In the shallowly implanted component, the ratio varied greatly from grain to grain, preventing comparison with the solar wind elemental composition.

  12. Nasal mask ventilation is better than face mask ventilation in edentulous patients

    PubMed Central

    Kapoor, Mukul Chandra; Rana, Sandeep; Singh, Arvind Kumar; Vishal, Vindhya; Sikdar, Indranil

    2016-01-01

    Background and Aims: Face mask ventilation of the edentulous patient is often difficult as ineffective seating of the standard mask to the face prevents attainment of an adequate air seal. The efficacy of nasal ventilation in edentulous patients has been cited in case reports but has never been investigated. Material and Methods: Consecutive edentulous adult patients scheduled for surgery under general anesthesia with endotracheal intubation, during a 17-month period, were prospectively evaluated. After induction of anesthesia and administration of neuromuscular blocker, lungs were ventilated with a standard anatomical face mask of appropriate size, using a volume controlled anesthesia ventilator with tidal volume set at 10 ml/kg. In case of inadequate ventilation, the mask position was adjusted to achieve best-fit. Inspired and expired tidal volumes were measured. Thereafter, the face mask was replaced by a nasal mask and after achieving best-fit, the inspired and expired tidal volumes were recorded. The difference in expired tidal volumes and airway pressures at best-fit with the use of the two masks and number of patients with inadequate ventilation with use of the masks were statistically analyzed. Results: A total of 79 edentulous patients were recruited for the study. The difference in expiratory tidal volumes with the use of the two masks at best-fit was statistically significant (P = 0.0017). Despite the best-fit mask placement, adequacy of ventilation could not be achieved in 24.1% patients during face mask ventilation, and 12.7% patients during nasal mask ventilation and the difference was statistically significant. Conclusion: Nasal mask ventilation is more efficient than standard face mask ventilation in edentulous patients. PMID:27625477

  13. Nasal mask ventilation is better than face mask ventilation in edentulous patients

    PubMed Central

    Kapoor, Mukul Chandra; Rana, Sandeep; Singh, Arvind Kumar; Vishal, Vindhya; Sikdar, Indranil

    2016-01-01

    Background and Aims: Face mask ventilation of the edentulous patient is often difficult as ineffective seating of the standard mask to the face prevents attainment of an adequate air seal. The efficacy of nasal ventilation in edentulous patients has been cited in case reports but has never been investigated. Material and Methods: Consecutive edentulous adult patients scheduled for surgery under general anesthesia with endotracheal intubation, during a 17-month period, were prospectively evaluated. After induction of anesthesia and administration of neuromuscular blocker, lungs were ventilated with a standard anatomical face mask of appropriate size, using a volume controlled anesthesia ventilator with tidal volume set at 10 ml/kg. In case of inadequate ventilation, the mask position was adjusted to achieve best-fit. Inspired and expired tidal volumes were measured. Thereafter, the face mask was replaced by a nasal mask and after achieving best-fit, the inspired and expired tidal volumes were recorded. The difference in expired tidal volumes and airway pressures at best-fit with the use of the two masks and number of patients with inadequate ventilation with use of the masks were statistically analyzed. Results: A total of 79 edentulous patients were recruited for the study. The difference in expiratory tidal volumes with the use of the two masks at best-fit was statistically significant (P = 0.0017). Despite the best-fit mask placement, adequacy of ventilation could not be achieved in 24.1% patients during face mask ventilation, and 12.7% patients during nasal mask ventilation and the difference was statistically significant. Conclusion: Nasal mask ventilation is more efficient than standard face mask ventilation in edentulous patients.

  14. Helium abundances on the moon: Assumptions and estimates

    NASA Astrophysics Data System (ADS)

    Taylor, Lawrence A.

    Nuclear energy is a highly desirable source of energy, and He-3 is the most prized of the fusion reactants. As the Wisconsin Group has emphasized, He-3 may be the only true economic ore on the Moon. The lack of a shielding atmosphere on the Moon permits solar-wind alpha particles to impinge upon the lunar regolith and become implanted into the various solid components. In particular, large quantities of helium (5 to 50 ppm) are presented. The measured parameter of Is/FeO, a direct indicator of maturity and exposure age, can be used as a first approximation to predict the abundances of many solar-wind components in the soils. However, because ilmenite has a much higher retentivity for helium than the other phases, the TiO2 contents of the soils are better indicators of helium contents (Taylor, Space 90). High-Ti mare bassalt regions, such as at the Apollo 17 locale, appear to be the best areas for He mining (15 to 50 ppm HeT), versus 3 to 9 ppm in the Highlands. However, the relationships between Is/FeO, TiO2 and He-3 contents are complicated - e.g., many of the most He-rich soils are immature to submature. The amount of He-3 in the regolith of the moon is estimated at 220,000 tons in the outer 2 m of the Maria.

  15. Automatic Refilling System For Liquid Helium

    NASA Technical Reports Server (NTRS)

    Serlemitsos, Aristides; Sansebastian, Mark; Geagen, Jay; Warner, Brent

    1990-01-01

    Cryogenic experiments left unattended for days. System automatically replenishes liquid helium in cryogenic experimental apparatus as liquid evaporates. Automatic filling system transfers liquid helium from storage vessel to experimental apparatus under computer control. Gaseous helium from cylinder supplies pumping pressure. Circuit senses level of liquid helium by sensing voltage across measuring resistors in series with silicon resistance thermometers (SRT's). Low voltage indicates SRT covered, while high voltage indicates uncovered.

  16. Masking property of quantum random cipher with phase mask encryption

    NASA Astrophysics Data System (ADS)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  17. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... 21 Food and Drugs 6 2012-04-01 2012-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  18. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 2 2013-10-01 2013-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  19. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 2 2014-10-01 2014-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  20. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 6 2014-04-01 2014-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  1. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 6 2013-04-01 2013-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  2. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 30 Mineral Resources 2 2012-07-01 2012-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  3. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 30 Mineral Resources 2 2014-07-01 2014-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  4. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 2 2012-10-01 2012-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  5. 30 CFR 556.11 - Helium.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 30 Mineral Resources 2 2013-07-01 2013-07-01 false Helium. 556.11 Section 556.11 Mineral Resources... § 556.11 Helium. (a) Each lease issued or continued under these regulations shall be subject to a... helium from all gas produced from the leased area. (b) In case the United States elects to take...

  6. Multipurpose top for liquid helium Dewar

    NASA Technical Reports Server (NTRS)

    Murphy, R. S.; Anderholm, J. R.

    1972-01-01

    Multipurpose top was fabricated for liquid helium Dewar flask which guards against flash vaporization of liquid helium and allows boiling temperature of liquid helium to be lowered by reduction of ambient pressure in Dewar flask. Device is rugged and simple, and does not require frequent calibrations or adjustments.

  7. Applying the helium ionization detector in chromatography

    NASA Technical Reports Server (NTRS)

    Gibson, E. K.; Andrawes, F. F.; Brazell, R. S.

    1981-01-01

    High noise levels and oversensitivity of helium detector make flame-ionization and thermal-conductivity detectors more suitable for chromotography. Deficiencies are eliminated by modifying helium device to operate in saturation rather than multiplication mode. Result is low background current, low noise, high stability, and high sensitivity. Detector analyzes halocarbons, hydrocarbons, hydrogen cyanide, ammonia, and inorganics without requiring expensive research-grade helium.

  8. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 6 2010-04-01 2010-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  9. 21 CFR 582.1355 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 6 2011-04-01 2011-04-01 false Helium. 582.1355 Section 582.1355 Food and Drugs FOOD AND DRUG ADMINISTRATION, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) ANIMAL DRUGS, FEEDS... Helium. (a) Product. Helium. (b) Conditions of use. This substance is generally recognized as safe...

  10. 43 CFR 3100.1 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 2 2011-10-01 2011-10-01 false Helium. 3100.1 Section 3100.1 Public Lands: Interior Regulations Relating to Public Lands (Continued) BUREAU OF LAND MANAGEMENT, DEPARTMENT OF THE... Helium. The ownership of and the right to extract helium from all gas produced from lands leased...

  11. LCD masks for spatial augmented reality

    NASA Astrophysics Data System (ADS)

    Smithwick, Quinn Y. J.; Reetz, Daniel; Smoot, Lanny

    2014-03-01

    One aim of Spatial Augmented Reality is to visually integrate synthetic objects into real-world spaces amongst physical objects, viewable by many observers without 3D glasses, head-mounted displays or mobile screens. In common implementations, using beam-combiners, scrim projection, or transparent self-emissive displays, the synthetic object's and real-world scene's light combine additively. As a result, synthetic objects appear low-contrast and semitransparent against well-lit backgrounds, and do not cast shadows. These limitations prevent synthetic objects from appearing solid and visually integrated into the real-world space. We use a transparent LCD panel as a programmable dynamic mask. The LCD panel displaying the synthetic object's silhouette mask is colocated with the object's color image, both staying aligned for all points-of-view. The mask blocks the background providing occlusion, presents a black level for high-contrast images, blocks scene illumination thus casting true shadows, and prevents blow-by in projection scrim arrangements. We have several implementations of SAR with LCD masks: 1) beam-combiner with an LCD mask, 2) scrim projection with an LCD mask, and 3) transparent OLED display with an LCD mask. Large format (80" diagonal) and dual layer volumetric variations are also implemented.

  12. The Sensitivity of Coded Mask Telescopes

    NASA Technical Reports Server (NTRS)

    Skinner, Gerald K.

    2008-01-01

    Simple formulae are often used to estimate the sensitivity of coded mask X-ray or gamma-ray telescopes, but t,hese are strictly only applicable if a number of basic assumptions are met. Complications arise, for example, if a grid structure is used to support the mask elements, if the detector spatial resolution is not good enough to completely resolve all the detail in the shadow of the mask or if any of a number of other simplifying conditions are not fulfilled. We derive more general expressions for the Poisson-noise-limited sensitivity of astronomical telescopes using the coded mask technique, noting explicitly in what circumstances they are applicable. The emphasis is on using nomenclature and techniques that result in simple and revealing results. Where no convenient expression is available a procedure is given which allows the calculation of the sensitivity. We consider certain aspects of the optimisation of the design of a coded mask telescope and show that when the detector spatial resolution and the mask to detector separation are fixed, the best source location accuracy is obtained when the mask elements are equal in size to the detector pixels.

  13. An interactive tool for gamut masking

    NASA Astrophysics Data System (ADS)

    Song, Ying; Lau, Cheryl; Süsstrunk, Sabine

    2014-02-01

    Artists often want to change the colors of an image to achieve a particular aesthetic goal. For example, they might limit colors to a warm or cool color scheme to create an image with a certain mood or feeling. Gamut masking is a technique that artists use to limit the set of colors they can paint with. They draw a mask over a color wheel and only use the hues within the mask. However, creating the color palette from the mask and applying the colors to the image requires skill. We propose an interactive tool for gamut masking that allows amateur artists to create an image with a desired mood or feeling. Our system extracts a 3D color gamut from the 2D user-drawn mask and maps the image to this gamut. The user can draw a different gamut mask or locally refine the image colors. Our voxel grid gamut representation allows us to represent gamuts of any shape, and our cluster-based image representation allows the user to change colors locally.

  14. Achievements and challenges of EUV mask imaging

    NASA Astrophysics Data System (ADS)

    Davydova, Natalia; van Setten, Eelco; de Kruif, Robert; Connolly, Brid; Fukugami, Norihito; Kodera, Yutaka; Morimoto, Hiroaki; Sakata, Yo; Kotani, Jun; Kondo, Shinpei; Imoto, Tomohiro; Rolff, Haiko; Ullrich, Albrecht; Lammers, Ad; Schiffelers, Guido; van Dijk, Joep

    2014-07-01

    The impact of various mask parameters on CDU combined in a total mask budget is presented, for 22 nm lines, for reticles used for NXE:3300 qualification. Apart from the standard mask CD measurements, actinic spectrometry of multilayer is used to qualify reflectance uniformity over the image field; advanced 3D metrology is applied for absorber profile characterization including absorber height and side wall angle. The predicted mask impact on CDU is verified using actual exposure data collected on multiple NXE:3300 scanners. Mask 3D effects are addressed, manifesting themselves in best focus shifts for different structures exposed with off-axis illumination. Experimental NXE:3300 results for 16 nm dense lines and 20 nm (semi-)isolated spaces are shown: best focus range reaches 24 nm. A mitigation strategy by absorber height optimization is proposed based on experimental results of a special mask with varying absorber heights. Further development of a black image border for EUV mask is considered. The image border is a pattern free area surrounding image field preventing exposure the image field neighborhood on wafer. Normal EUV absorber is not suitable for this purpose as it has 1-3% EUV reflectance. A current solution is etching of ML down to substrate reducing EUV reflectance to <0.05%. A next step in the development of the black border is the reduction of DUV Out-of-Band reflectance (<1.5%) in order to cope with DUV light present in EUV scanners. Promising results achieved in this direction are shown.

  15. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  16. Intact crowding and temporal masking in dyslexia.

    PubMed

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia. PMID:26505966

  17. Space and time in masking and crowding.

    PubMed

    Lev, Maria; Polat, Uri

    2015-01-01

    Masking and crowding are major phenomena associated with contextual modulations, but the relationship between them remains unclear. We have recently shown that crowding is apparent in the fovea when the time available for processing is limited, pointing to the strong relationship between crowding in the spatial and temporal domains. Models of crowding emphasize the size (acuity) of the target and the spacing between the target and flankers as the main determinants that predict crowding. Our model, which is based on lateral interactions, posits that masking and crowding are related in the spatial and temporal domains at the fovea and periphery and that both can be explained by the increasing size of the human perceptive field (PF) with increasing eccentricity. We explored the relations between masking and crowding using letter identification and contrast detection by correlating the crowding effect with the estimated size of the PF and with masking under different spatiotemporal conditions. We found that there is a large variability in PF size and crowding effects across observers. Nevertheless, masking and crowding were both correlated with the estimated size of the PF in the fovea and periphery under a specific range of spatiotemporal parameters. Our results suggest that under certain conditions, crowding and masking share common neural mechanisms that underlie the spatiotemporal properties of these phenomena in both the fovea and periphery. These results could explain the transfer of training gains from spatiotemporal Gabor masking to letter acuity, reading, and reduced crowding.

  18. Intact crowding and temporal masking in dyslexia.

    PubMed

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia.

  19. Cochlear Implants

    MedlinePlus

    ... outside of the body, behind the ear. A second part is surgically placed under the skin. An implant does not restore normal hearing. It can help a person understand speech. Children and adults can benefit from them. National Institute on Deafness and Other Communication Disorders

  20. Facial implants.

    PubMed

    Arcuri, M R; Rubenstein, J T

    1998-01-01

    The application of endosseous dental implants for the retention and stabilization of extraoral prostheses and hearing aids has been shown to be effective functionally and aesthetically. Implants have reduced the need for adhesive use, simplifying cleaning procedures and thus extending the life of the prosthesis. Implant-retained prostheses have provided patients the opportunity to participate in routine activities such as work, shopping, swimming, and jogging with less fear of losing their prosthesis. The implants' impact on patients has resulted in their ability to function in society with confidence that their defects will be less noticeable and their ability to respond to the environment enhanced. The culmination of these effects have without doubt improved the overall quality of life for patients. As with any new technology, its application will encounter unanticipated problems and some limitations in use. As the art and science of this technique evolve, however, it is anticipated that it will result in the ability to provide improved health care for patients.

  1. Vortex Rings in Superfluid Helium

    NASA Astrophysics Data System (ADS)

    Alamri, Sultan Z.; Barenghi, Carlo F.

    2008-11-01

    We present results of numerical simulations of large-scale vortex rings in superfluid helium. These large-scale vortex rings consists of many discrete (quantized) vortex filaments which interact with each other moving according to the Biot-Savart law. Lifetime, structural stability and speed of large-scale vortex rings will be discussed and compared to experimental results.

  2. Why Helium Ends in "-Ium"

    ERIC Educational Resources Information Center

    Jensen, William B.; Holme, Thomas; Cooper, Melanie; White, Carol

    2004-01-01

    Edward Frankland and Norman Lockyer researched upon a gaseous spectra in relation to the physical constitution of the sun and named it as "helium" (from Greek "helios" meaning "sun"). Since Lockyer apparently never formally proposed the name in print, it is not known why he chose to use a metallic end "ium".

  3. Helium diffusion in the sun

    NASA Technical Reports Server (NTRS)

    Bahcall, J. N.; Pinsonneault, M. H.

    1992-01-01

    We calculate improved standard solar models using the new Livermore (OPAL) opacity tables, an accurate (exportable) nuclear energy generation routine which takes account of recent measurements and analyses, and the recent Anders-Grevesse determination of heavy element abundances. We also evaluate directly the effect of the diffusion of helium with respect to hydrogen on the calculated neutrino fluxes, on the primordial solar helium abundance, and on the depth of the convective zone. Helium diffusion increases the predicted event rates by about 0.8 SNU, or 11 percent of the total rate, in the chlorine solar neutrino experiment, by about 3.5 SNU, or 3 percent, in the gallium solar neutrino experiments, and by about 12 percent in the Kamiokande and SNO solar neutrino experiments. The best standard solar model including helium diffusion and the most accurate nuclear parameters, element abundances, and radiative opacity predicts a value of 8.0 SNU +/- 3.0 SNU for the C1-37 experiment and 132 +21/-17 SNU for the Ga - 71 experiment, where the uncertainties include 3 sigma errors for all measured input parameters.

  4. A binary masking technique for isolating energetic masking in speech perception

    NASA Astrophysics Data System (ADS)

    Brungart, Douglas S.; Simpson, Brian D.; Chang, Peter S.; Wang, Deliang

    2005-04-01

    When a target speech signal is obscured by interfering speech, two distinct types of masking contribute to the resulting degradation in the intelligibility of the target talker: energetic masking caused by overlap in the time-frequency distribution of energy in the two voices, and informational masking caused by the listener's inability to correctly segregate the acoustic elements of the two voices into distinct streams. This study attempted to isolate the effects of energetic masking on multitalker speech perception with ideal time-frequency binary masks that retained those spectro-temporal regions of the acoustic mixture that were dominated by the target speech but eliminated those regions that were dominated by the interfering speech. This procedure removed the same phonetic information from the target speech that would ordinarily be lost due to energetic masking, but eliminated the possibility for the kinds of target-masker confusions that are thought to produce informational masking. The results suggest that energetic masking may play a surprisingly small role in the overall masking that occurs in certain types of multitalker speech signals. They also indicate that the number of competing talkers has a much greater influence than target-masker similarity on the amount of energetic masking that occurs in a multitalker stimulus.

  5. Geomagnetically trapped energetic helium nuclei

    SciTech Connect

    Chen, J.; Gregory Guzik, T.; Wefel, J.P.; Roger Pyle, K.; Cooper, J.F.

    1996-07-01

    Geomagnetically trapped helium nuclei, at high energy ({approximately}40{endash}100 MeV/nucleon), have been measured by the ONR-604 instrument during the 1990/1991 CRRES mission. The ONR-604 instrument resolved the isotopes of helium with a mass resolution of 0.1 amu. The energetic helium observed at {ital L}{lt}2.3 have a pitch angle distribution peaking perpendicular to the local magnetic field, which is characteristic of a trapped population. Both the trapped {sup 3}He and {sup 4}He show two peaks at {ital L}=1.2 and 1.9. Each isotope{close_quote}s flux, in each peak, can be characterized by a power law energy spectrum. The energy spectrum of the {sup 3}He is different from that of {sup 4}He, indicating that the {sup 3}He/{sup 4}He ratio is energy dependent. Over the energy range of 51{endash}86 MeV/nucleon, the {sup 3}He/{sup 4}He ratio is 8.7{plus_minus}3.1 at {ital L}=1.1{endash}1.5 and is 2.4{plus_minus}0.6 at {ital L}=1.5{endash}2.3. The trapped helium counting rates decrease gradually with time during the CRRES mission, when the anomalous component is excluded from the inner heliosphere, indicating that these high energy ions were not injected by flares during this time period. The decrease in intensity is attributed mainly to the events around {ital L}=1.9. The helium around {ital L}=1.2, dominated by {sup 3}He, does not show a significant temporal evolution, which implies a long-term energetic trapped {sup 3}He population. Two possible origins of the geomagnetically trapped helium isotopes are the interactions of energetic protons with the upper atmosphere and/or the inward diffusion and acceleration of helium ions due to electric-field fluctuations. {copyright} {ital 1996 American Institute of Physics.}

  6. Printed shadow masks for organic transistors

    NASA Astrophysics Data System (ADS)

    Noguchi, Yoshiaki; Sekitani, Tsuyoshi; Someya, Takao

    2007-09-01

    We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet. After the deposition of the pentacene layer, the shadow mask is peeled off from the base film without any mechanical damages to the lower structures. The mobility in the saturation regime is 0.4cm2/Vs and the on-off ratio exceeds 105.

  7. Actinic review of EUV masks

    NASA Astrophysics Data System (ADS)

    Feldmann, Heiko; Ruoff, Johannes; Harnisch, Wolfgang; Kaiser, Winfried

    2010-04-01

    Management of mask defects is a major challenge for the introduction of EUV for HVM production. Once a defect has been detected, its printing impact needs to be predicted. Potentially the defect requires some repair, the success of which needs to be proven. This defect review has to be done with an actinic inspection system that matches the imaging conditions of an EUV scanner. During recent years, several concepts for such an aerial image metrology system (AIMS™) have been proposed. However, until now no commercial solution exists for EUV. Today, advances in EUV optics technology allow envisioning a solution that has been discarded before as unrealistic. We present this concept and its technical cornerstones.While the power requirement for the EUV source is less demanding than for HVM lithography tools, radiance, floor space, and stability are the main criteria for source selection. The requirement to emulate several generations of EUV scanners demands a large flexibility for the ilumination and imaging systems. New critical specifications to the EUV mirrors in the projection microscope can be satisfied using our expertise from lithographic mirrors. In summary, an EUV AIMS™ meeting production requirements seems to be feasible.

  8. When Bad Masks Turn Good

    NASA Astrophysics Data System (ADS)

    Abraham, Roberto G.

    In keeping with the spirit of a meeting on ‘masks,' this talk presents two short stories on the theme of dust. In the first, dust plays the familiar role of the evil obscurer, the enemy to bedefeated by the cunning observer in order to allow a key future technology (adaptive optics) to be exploited fully by heroic astronomers. In the second story, dust itself emerges as the improbable hero, in the form of a circumstellar debris disks. I will present evidence of a puzzling near-infrared excess in the continuum of high-redshift galaxies and will argue that the seemingly improbable origin of this IR excess is a population of young circumstellar disks formed around high-mass stars in distant galaxies. Assuming circumstellar disks extend down to lower masses,as they do in our own Galaxy, the excess emission presents us with an exciting opportunity to measure the formation rate of planetary systems in distant galaxies at cosmic epochs before our own solar system formed.

  9. Damage accumulation in neon implanted silicon

    SciTech Connect

    Oliviero, E.; Peripolli, S.; Amaral, L.; Fichtner, P. F. P.; Beaufort, M. F.; Barbot, J. F.; Donnelly, S. E.

    2006-08-15

    Damage accumulation in neon-implanted silicon with fluences ranging from 5x10{sup 14} to 5x10{sup 16} Ne cm{sup -2} has been studied in detail. As-implanted and annealed samples were investigated by Rutherford backscattering spectrometry under channeling conditions and by transmission electron microscopy in order to quantify and characterize the lattice damage. Wavelength dispersive spectrometry was used to obtain the relative neon content stored in the matrix. Implantation at room temperature leads to the amorphization of the silicon while a high density of nanosized bubbles is observed all along the ion distribution, forming a uniform and continuous layer for implantation temperatures higher than 250 deg.C. Clusters of interstitial defects are also present in the deeper part of the layer corresponding to the end of range of ions. After annealing, the samples implanted at temperatures below 250 deg.C present a polycrystalline structure with blisters at the surface while in the other samples coarsening of bubbles occurs and nanocavities are formed together with extended defects identified as (311) defects. The results are discussed in comparison to the case of helium-implanted silicon and in the light of radiation-enhanced diffusion.

  10. Investigation of EUV haze defect: molecular behaviors of mask cleaning chemicals on EUV mask surfaces

    NASA Astrophysics Data System (ADS)

    Choi, Jaehyuck; Novak, Steve; Kandel, Yudhishthir; Denbeaux, Greg; Lee, Han-shin; Ma, Andy; Goodwin, Frank

    2012-03-01

    Photo-induced defects (or haze defects) on 193nm optic masks (haze defects) have been a serious problem not only to reticle engineers working for mask manufacturing and handling but also to photo-lithography engineers. The most widely accepted explanation of the root causes of haze defects is the cleaning chemical residues remaining on the mask surface and unavoidable outgassed molecules that outgas from pellicle materials when exposed to 193nm radiation. These have been significant challenges for reticle cleaning engineers who need to use cleaning chemicals whose residues do not lead to progressive defect formation on the mask and to find improved materials to minimize pellicle outgassing. It is assumed that contamination generation on EUV masks would have a higher probability than on optic masks, primarily since EUV masks are not protected by a pellicle and amorphous carbon films can accumulate during exposure to EUV light. While there is potential to mitigate the generation of carbon contamination by improving the exposure tool environment and removing carbon films using in-situ atomic hydrogen cleaning, it is not yet clear whether the reaction of mask cleaning chemicals to EUV radiation will lead to creation of progressive defects on EUV mask surfaces. With the work to being done it has been observed that carbon contamination on EUV masks dominates any effects of solvent chemicals under normal environmental or exposure conditions (from atmospheric pressure up to a vacuum level of 10-6 Torr) during EUV exposure. However, it is still unknown whether residual cleaning chemicals will provide a nucleus for progressive defect formation during exposure. This lack of understanding needs to be addressed by the industry as EUV masks are expected to undergo more frequent cleaning cycles. In this work, we will report on an investigation of the molecular behavior of cleaning chemicals on EUV mask surfaces during EUV exposure. Movement (e.g., migration or aggregation) of

  11. Weldability of helium-containing stainless steels using a YAG laser

    NASA Astrophysics Data System (ADS)

    Kawano, S.; Nakahigashi, S.; Uesugi, K.; Nakamura, H.; Kono, W.; Fukuya, K.; Kano, F.; Hasegawa, A.; Abe, K.

    1998-10-01

    Bead-on-plate welding experiments using a 400 W YAG laser were conducted on SUS304 stainless steels implanted with helium ions of 0.5, 5 and 50 appm uniformly to a depth of 0.25 mm. High heat input welding at 20 kJ/cm caused surface grain boundary cracking in the heat-affected zone at 50 appm He. Cross-sectional observations after etching in oxalic acid solution revealed that bubble growth at grain boundaries in the heat-affected zone was enhanced at higher heat input and at higher helium concentrations. Bubble growth was negligible for the laser welding condition of 1 kJ/cm even at 50 appm He. The results suggest that YAG laser welding is a promising welding technique for stainless steels containing high amounts of helium.

  12. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    SciTech Connect

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  13. High-temperature helium-loop facility

    SciTech Connect

    Tokarz, R.D.

    1981-09-01

    The high-temperature helium loop is a facility for materials testing in ultrapure helium gas at high temperatures. The closed loop system is capable of recirculating high-purity helium or helium with controlled impurities. The gas loop maximum operating conditions are as follows: 300 psi pressure, 500 lb/h flow rate, and 2100/sup 0/F temperature. The two test sections can accept samples up to 3.5 in. diameter and 5 ft long. The gas loop is fully instrumented to continuously monitor all parameters of loop operation as well as helium impurities. The loop is fully automated to operate continuously and requires only a daily servicing by a qualified operator to replenish recorder charts and helium makeup gas. Because of its versatility and high degree of parameter control, the helium loop is applicable to many types of materials research. This report describes the test apparatus, operating parameters, peripheral systems, and instrumentation system.

  14. Inverse lithography using sparse mask representations

    NASA Astrophysics Data System (ADS)

    Ionescu, Radu C.; Hurley, Paul; Apostol, Stefan

    2015-03-01

    We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to rectilinear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.

  15. Shadow-masked growth and its applications

    NASA Astrophysics Data System (ADS)

    Demeester, Piet M. A.; Coudenys, G.; Vermeire, Gerrit; Moerman, Ingrid; Zhu, Youcai; Buydens, Luc; Eeckhout, C.; Van Daele, Peter

    1993-02-01

    In this paper we will review the shadow masked growth technique and its applications. The technique enables us to change the layer thicknesses over a substrate by the variation in dimensions of windows in the shadow mask. One of the major application areas is the realization of photonic integrated circuits where materials with a different bandgap have to be integrated on the same substrate. The combination of thickness variations with the use of quantum wells results in the required bandgap changes. In the paper we will first start with an overview of the basic technology of shadow masked growth and in a second part we will discuss some of the important applications. Note that we will limit ourselves to the shadow masked growth technique and no review will be given on other technologies such as selective growth.

  16. Simplified models for mask roughness induced LER

    SciTech Connect

    McClinton, Brittany; Naulleau, Patrick

    2011-02-21

    The ITRS requires < 1.2nm line-edge roughness (LER) for the 22nm half-pitch node. Currently, we can consistently achieve only about 3nm LER. Further progress requires understanding the principle causes of LER. Much work has already been done on how both the resist and LER on the mask effect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and factor into LER limits. Presently, mask-roughness induced LER is studied via full 2D aerial image modeling and subsequent analysis of the resulting image. This method is time consuming and cumbersome. It is, therefore, the goal of this research to develop a useful 'rule-of-thumb' analytic model for mask roughness induced LER to expedite learning and understanding.

  17. Hydrogen, helium, and other solar-wind components in lunar soil - Abundances and predictions

    NASA Technical Reports Server (NTRS)

    Taylor, Lawrence A.

    1990-01-01

    The lack of a shielding atmosphere on the moon permits solar-wind particles to impinge upon the lunar soil and become implanted into the various phases which comprise the soil. Relatively large quantities of solar-wind implanted hydrogen (50-100 ppm) and helium (10-50 ppm) are present. The measured parameter of I(s)FeO, a direct indicator of maturity and exposure age, can be used as a first approximation to predict the abundances of many solar-wind components in the soils. However, because ilmenite acts as a 'sponge' for the retention of certain elements, the TiO2 content of the soil is a better indicator for hydrogen and helium contents.

  18. Approximating the Helium Wavefunction in Positronium-Helium Scattering

    NASA Technical Reports Server (NTRS)

    DiRienzi, Joseph; Drachman, Richard J.

    2003-01-01

    In the Kohn variational treatment of the positronium- hydrogen scattering problem the scattering wave function is approximated by an expansion in some appropriate basis set, but the target and projectile wave functions are known exactly. In the positronium-helium case, however, a difficulty immediately arises in that the wave function of the helium target atom is not known exactly, and there are several ways to deal with the associated eigenvalue in formulating the variational scattering equations to be solved. In this work we will use the Kohn variational principle in the static exchange approximation to d e t e e the zero-energy scattering length for the Ps-He system, using a suite of approximate target functions. The results we obtain will be compared with each other and with corresponding values found by other approximation techniques.

  19. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, Bill R.; Ashley, Paul R.; Buchal, Christopher J.

    1989-01-01

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO.sub.3 crystals are implanted with high concentrations of Ti dopant at ion energies of about 350 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000.degree. C. produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality single crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguides properties.

  20. Method of fabricating optical waveguides by ion implantation doping

    DOEpatents

    Appleton, B.R.; Ashley, P.R.; Buchal, C.J.

    1987-03-24

    A method for fabricating high-quality optical waveguides in optical quality oxide crystals by ion implantation doping and controlled epitaxial recrystallization is provided. Masked LiNbO/sub 3/ crystals are implanted with high concentrations of Ti dopant at ion energies of about 360 keV while maintaining the crystal near liquid nitrogen temperature. Ion implantation doping produces an amorphous, Ti-rich nonequilibrium phase in the implanted region. Subsequent thermal annealing in a water-saturated oxygen atmosphere at up to 1000/degree/C produces solid-phase epitaxial regrowth onto the crystalline substrate. A high-quality crystalline layer results which incorporates the Ti into the crystal structure at much higher concentrations than is possible by standard diffusion techniques, and this implanted region has excellent optical waveguiding properties.

  1. The neural processing of masked speech.

    PubMed

    Scott, Sophie K; McGettigan, Carolyn

    2013-09-01

    Spoken language is rarely heard in silence, and a great deal of interest in psychoacoustics has focused on the ways that the perception of speech is affected by properties of masking noise. In this review we first briefly outline the neuroanatomy of speech perception. We then summarise the neurobiological aspects of the perception of masked speech, and investigate this as a function of masker type, masker level and task. This article is part of a Special Issue entitled "Annual Reviews 2013". PMID:23685149

  2. Thorough characterization of a EUV mask

    SciTech Connect

    Mizuno, H.; McIntyre, G.; Koay, C.-W.; Burkhardt, M.; He, L.; Hartley, J.; Johnson, C.; Raghunathan, S.; Goldberg, K.; Mochi, I.; La Fontaine, B.; Wood, O.

    2009-06-25

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT). In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics, The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements, However, the resist printing results for the isolated space patterns are slightly different. The cause ofthis discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT, The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  3. Inspection of lithographic mask blanks for defects

    DOEpatents

    Sommargren, Gary E.

    2001-01-01

    A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.

  4. Mask cost of ownership for advanced lithography

    NASA Astrophysics Data System (ADS)

    Muzio, Edward G.; Seidel, Philip K.

    2000-07-01

    As technology advances, becoming more difficult and more expensive, the cost of ownership (CoO) metric becomes increasingly important in evaluating technical strategies. The International SEMATECH CoC analysis has steadily gained visibility over the past year, as it attempts to level the playing field between technology choices, and create a fair relative comparison. In order to predict mask cots for advanced lithography, mask process flows are modeled using bets-known processing strategies, equipment cost, and yields. Using a newly revised yield mode, and updated mask manufacture flows, representative mask flows can be built. These flows are then used to calculate mask costs for advanced lithography down to the 50 nm node. It is never the goal of this type of work to provide absolute cost estimates for business planning purposes. However, the combination of a quantifiable yield model with a clearly defined set of mask processing flows and a cost model based upon them serves as an excellent starting point for cost driver analysis and process flow discussion.

  5. VSP wave separation by adaptive masking filters

    NASA Astrophysics Data System (ADS)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  6. Short Implants: New Horizon in Implant Dentistry

    PubMed Central

    Gulati, Manisha; Garg, Meenu; Pathak, Chetan

    2016-01-01

    The choice of implant length is an essential factor in deciding the survival rates of these implants and the overall success of the prosthesis. Placing an implant in the posterior part of the maxilla and mandible has always been very critical due to poor bone quality and quantity. Long implants can be placed in association with complex surgical procedures such as sinus lift and bone augmentation. These techniques are associated with higher cost, increased treatment time and greater morbidity. Hence, there is need for a less invasive treatment option in areas of poor bone quantity and quality. Data related to survival rates of short implants, their design and prosthetic considerations has been compiled and structured in this manuscript with emphasis on the indications, advantages of short implants and critical biomechanical factors to be taken into consideration when choosing to place them. Studies have shown that comparable success rates can be achieved with short implants as those with long implants by decreasing the lateral forces to the prosthesis, eliminating cantilevers, increasing implant surface area and improving implant to abutment connection. Short implants can be considered as an effective treatment alternative in resorbed ridges. Short implants can be considered as a viable treatment option in atrophic ridge cases in order to avoid complex surgical procedures required to place long implants. With improvement in the implant surface geometry and surface texture, there is an increase in the bone implant contact area which provides a good primary stability during osseo-integration. PMID:27790598

  7. 21 CFR 868.5560 - Gas mask head strap.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Gas mask head strap. 868.5560 Section 868.5560...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5560 Gas mask head strap. (a) Identification. A gas mask head strap is a device used to hold an anesthetic gas mask in position on a...

  8. 21 CFR 868.5560 - Gas mask head strap.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Gas mask head strap. 868.5560 Section 868.5560...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5560 Gas mask head strap. (a) Identification. A gas mask head strap is a device used to hold an anesthetic gas mask in position on a...

  9. 21 CFR 868.5560 - Gas mask head strap.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Gas mask head strap. 868.5560 Section 868.5560...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5560 Gas mask head strap. (a) Identification. A gas mask head strap is a device used to hold an anesthetic gas mask in position on a...

  10. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 42 Public Health 1 2012-10-01 2012-10-01 false Gas masks; required components. 84.111 Section 84... AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  11. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 42 Public Health 1 2014-10-01 2014-10-01 false Gas masks; required components. 84.111 Section 84... AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  12. 42 CFR 84.111 - Gas masks; required components.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 42 Public Health 1 2013-10-01 2013-10-01 false Gas masks; required components. 84.111 Section 84... AND HEALTH RESEARCH AND RELATED ACTIVITIES APPROVAL OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.111 Gas masks; required components. (a) Each gas mask described in § 84.110 shall, where its...

  13. Ceramic Masks--A Multi-Cultural Experience

    ERIC Educational Resources Information Center

    Penn, Elizabeth E.

    1978-01-01

    The creation of ceramic masks in reaction to the film, Roots, focused on the functions of the masks themselves within a particular society, the materials and techniques used to create these masks, and the identification of typical shapes of heads and facial features on the masks in each culture. (Author/RK)

  14. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2011-07-01 2011-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  15. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2010-07-01 2010-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  16. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2013-07-01 2013-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  17. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2014-07-01 2014-07-01 false Mask work fees. 211.3 Section... AND PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask...

  18. 37 CFR 211.3 - Mask work fees.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 37 Patents, Trademarks, and Copyrights 1 2012-07-01 2012-07-01 false Mask work fees. 211.3 Section... PROCEDURES MASK WORK PROTECTION § 211.3 Mask work fees. (a) Section 201.3 of this chapter prescribes the fees or charges established by the Register of Copyrights for services relating to mask works. (b)...

  19. Confined helium on Lagrange meshes.

    PubMed

    Baye, D; Dohet-Eraly, J

    2015-12-21

    The Lagrange-mesh method has the simplicity of a calculation on a mesh and can have the accuracy of a variational method. It is applied to the study of a confined helium atom. Two types of confinement are considered. Soft confinements by potentials are studied in perimetric coordinates. Hard confinement in impenetrable spherical cavities is studied in a system of rescaled perimetric coordinates varying in [0,1] intervals. Energies and mean values of the distances between electrons and between an electron and the helium nucleus are calculated. A high accuracy of 11 to 15 significant figures is obtained with small computing times. Pressures acting on the confined atom are also computed. For sphere radii smaller than 1, their relative accuracies are better than 10(-10). For larger radii up to 10, they progressively decrease to 10(-3), still improving the best literature results.

  20. Superfluid helium leak sealant study

    NASA Technical Reports Server (NTRS)

    Vorreiter, J. W.

    1981-01-01

    Twenty-one leak specimens were fabricated in the ends of stainless steel and aluminum tubes. Eighteen of these tubes were coated with a copolymer material to seal the leak. The other three specimens were left uncoated and served as control specimens. All 21 tubes were cold shocked in liquid helium 50 times and then the leak rate was measured while the tubes were submerged in superfluid helium at 1.7 K. During the cold shocks two of the coated specimens were mechanically damaged and eliminated from the test program. Of the remaining 16 coated specimens one suffered a total coating failure and resulting high leak rate. Another three of the coated specimens suffered partial coating failures. The leak rates of the uncoated specimens were also measured and reported. The significance of various leak rates is discussed in view of the infrared astronomical satellite (IRAS) Dewar performance.

  1. Rapidly pulsed helium droplet source

    SciTech Connect

    Pentlehner, Dominik; Riechers, Ricarda; Dick, Bernhard; Slenczka, Alkwin; Even, Uzi; Lavie, Nachum; Brown, Raviv; Luria, Kfir

    2009-04-15

    A pulsed valve connected to a closed-cycle cryostat was optimized for producing helium droplets. The pulsed droplet beam appeared with a bimodal size distribution. The leading part of the pulse consists of droplets suitable for doping with molecules. The average size of this part can be varied between 10{sup 4} and 10{sup 6} helium atoms, and the width of the distribution is smaller as compared to a continuous-flow droplet source. The system has been tested in a single pulse mode and at repetition rates of up to 500 Hz with almost constant intensity. The droplet density was found to be increased by more than an order of magnitude as compared to a continuous-flow droplet source.

  2. Exotic Ions in Superfluid Helium

    NASA Astrophysics Data System (ADS)

    Wei, Wanchun; Xie, Zhuolin; Cooper, Leon N.; Maris, Humphrey J.

    2016-11-01

    Exotic ions are negatively charged objects which have been detected in superfluid helium-4 at temperatures in the vicinity of 1 K. Mobility experiments in several different labs have revealed the existence of at least 18 such objects. These ions have a higher mobility than the normal negative ion and appear to be singly charged and smaller. We summarize the experimental situation, the possible structure of these objects, and how these objects might be formed.

  3. Superfluid Helium Tanker (SFHT) study

    NASA Technical Reports Server (NTRS)

    Eberhardt, Ralph N.; Dominick, Sam M.; Anderson, John E.; Gille, John P.; Martin, Tim A.; Marino, John S.; Paynter, Howard L.; Traill, R. Eric; Herzl, Alfred; Gotlib, Sam

    1988-01-01

    Replenishment of superfluid helium (SFHe) offers the potential of extending the on-orbit life of observatories, satellite instruments, sensors and laboratories which operate in the 2 K temperature regime. A reference set of resupply customers was identified as representing realistic helium servicing requirements and interfaces for the first 10 years of superfluid helium tanker (SFHT) operations. These included the Space Infrared Telescope Facility (SIRTF), the Advanced X-ray Astrophysics Facility (AXAF), the Particle Astrophysics Magnet Facility (Astromag), and the Microgravity and Materials Processing Sciences Facility (MMPS)/Critical Point Phenomena Facility (CPPF). A mixed-fleet approach to SFHT utilization was considered. The tanker permits servicing from the Shuttle cargo bay, in situ when attached to the OMV and carried to the user spacecraft, and as a depot at the Space Station. A SFHT Dewar ground servicing concept was developed which uses a dedicated ground cooling heat exchanger to convert all the liquid, after initial fill as normal fluid, to superfluid for launch. This concept permits the tanker to be filled to a near full condition, and then cooled without any loss of fluid. The final load condition can be saturated superfluid with any desired ullage volume, or the tank can be totally filed and pressurized. The SFHT Dewar and helium plumbing system design has sufficient component redundancy to meet fail-operational, fail-safe requirements, and is designed structurally to meet a 50 mission life usage requirement. Technology development recommendations were made for the selected SFHT concept, and a Program Plan and cost estimate prepared for a phase C/D program spanning 72 months from initiation through first launch in 1997.

  4. Cryopumping of hydrogen and helium

    SciTech Connect

    Halama, H.J.; Hseuh, H.C.; Chou, T.S.

    1981-01-01

    Results obtained in numerous tests on small (approx. 1000 l/S) and large (approx. 10/sup 5/ l/S) cryopumps cooled to 4.2/sup 0/K by LHe or between 10 to 20/sup 0/K by closed-cycle helium refrigerator are summarized. Then, measurements of the compound cryopump, designed to work on Tokamaks to handle the exhaust gases from the Torus are presented.

  5. Helium in interplanetary dust particles

    NASA Technical Reports Server (NTRS)

    Nier, A. O.; Schlutter, D. J.

    1993-01-01

    Helium and neon were extracted from fragments of individual stratosphere-collected interplanetary dust particles (IDP's) by subjecting them to increasing temperature by applying short-duration pulses of power in increasing amounts to the ovens containing the fragments. The experiment was designed to see whether differences in release temperatures could be observed which might provide clues as to the asteroidal or cometary origin of the particles. Variations were observed which show promise for elucidating the problem.

  6. The Chemical Evolution of Helium

    NASA Astrophysics Data System (ADS)

    Balser, Dana S.

    2006-12-01

    We report on measurements of the 4He abundance toward the outer Galaxy H II region S206 with the NRAO Green Bank Telescope. Observations of hydrogen and helium radio recombination lines between 8 and 10 GHz were made toward the peak radio continuum position in S206. We derive 4He/H=0.08459+/-0.00088 (random)+/-0.0010 (known systematic), 20% lower than optical recombination line results. It is difficult to reconcile the large discrepancy between the optical and radio values even when accounting for temperature, density, and ionization structure or for optical extinction by dust. Using only M17 and S206 we determine ΔY/ΔZ=1.41+/-0.62 in the Galaxy, consistent with standard chemical evolution models. High helium abundances in the old stellar population of elliptical galaxies can help explain the increase in UV emission with shorter wavelength between 2000 and 1200 Å, called the ``UV upturn'' or UVX. Our lower values of ΔY/ΔZ are consistent with a normal helium abundance at higher metallicity and suggest that other factors, such as a variable red giant branch mass loss with metallicity, may be important. When combined with 4He abundances in metal-poor galaxy H II regions, Magellanic Cloud H II regions, and M17 that have been determined from optical recombination lines, including the effects of temperature fluctuations, our radio 4He/H abundance ratio for S206 is consistent with a helium evolution of ΔY/ΔZ=1.6. A linear extrapolation to zero metallicity predicts a 4He/H primordial abundance ratio about 5% lower than that given by the Wilkinson Microwave Anisotropy Probe and standard big bang nucleosynthesis. The measured 4He abundances may be systematically underestimated by a few percent if clumping exists in these H II regions.

  7. Detecting scintillations in liquid helium

    NASA Astrophysics Data System (ADS)

    Huffman, P. R.; McKinsey, D. N.

    2013-09-01

    We review our work in developing a tetraphenyl butadiene (TPB)-based detection system for a measurement of the neutron lifetime using magnetically confined ultracold neutrons (UCN). As part of the development of the detection system for this experiment, we studied the scintillation properties of liquid helium itself, characterized the fluorescent efficiencies of different fluors, and built and tested three detector geometries. We provide an overview of the results from these studies as well as references for additional information.

  8. Mask topography effect in chromeless phase lithography

    NASA Astrophysics Data System (ADS)

    Philipsen, Vicky; Bekaert, Joost; Vandenberghe, Geert; Jonckheere, Rik; Van Den Broeke, Douglas; Socha, Robert

    2004-12-01

    Different types of phase-shift masks (PSM) in combination with the proper illumination condition are widely used to allow 193nm lithography to print ever-decreasing pitches with a sufficient process window. A viable option for the 65nm node is Chromeless Phase Lithography (CPL), which combines a chromeless phase shift mask and 193nm off-axis illumination. It has been demonstrated that CPL has a high flexibility for through pitch imaging. Also concerning mask making CPL masks showed advantages over alternating and attenuated PSM [1]. This paper discusses how the mask quality and its topography influence the imaging performance of CPL. It is shown that mask topography is an important factor for CPL, as the imaging relies also on the quartz depth differences in the mask. The wafer image is sensitive to phase variations induced by the quartz etch depth and the sidewall profile. Their impact is separately studied using rigorous 3D mask electro-magnetic field simulations (Sigma-C Solid-CM). Correlation of experimental results to simulation explains that the observed pitch-dependent tilt in the Bossung curves is mainly related to the 3D character of the mask. In search for a global compensation valid through pitch, the simulation study also evaluates the effect of other contributors such as lens aberrations in the optical system, assist features and half-toning Cr zebra lines in the design. However, as the tilt is inherent to the CPL mask fabrication, a compensation of the Bossung tilt effect can only be obtained for specific combinations of all sources, as will be shown. We concentrate on the imaging of 70nm lines and 100nm contact holes in pitches ranging from dense up to isolated. The wafers are exposed on an ASML PAS5500/1100 ArF scanner working with a 0.75NA projection lens and various types of off-axis illumination. The wafers are evaluated on a top-down CD SEM (KLA-Tencor 8250XR).

  9. Vorticity matching in superfluid helium

    NASA Astrophysics Data System (ADS)

    Samuels, David C.

    1991-12-01

    Recent experiments have rekindled interest in high Reynolds number flows using superfluid helium. In a continuing series of experiments, the flow of helium II through various devices (smooth pipes, corrugated pipes, valves, venturies, turbine flowmeters, and coanda flowmeters for example) was investigated. In all cases, the measured values (typically, mass flow rates and pressure drops) were found to be well described by classical relations for high Reynolds flows. This is unexpected since helium II consists of two interpenetrating fluids; one fluid with nonzero viscosity (the normal fluid) and one with zero viscosity (the superfluid). Only the normal fluid component should directly obey classical relations. Since the experiments listed above only measure the external behavior of the flow (i.e., pressure drops over devices), there is a great deal of room for interpretation of their results. One possible interpretation is that in turbulent flows the normal fluid and the superfluid velocity fields are somehow 'locked' together, presumably by the mutual friction force between the superfluid vortex filaments and the normal fluid. We refer to this locking together of the two fluids as 'vorticity matching.'

  10. Particle detection using superfluid helium

    SciTech Connect

    Bandler, S.R.; Lanou, R.E.; Maris, H.J.; More, T.; Porter, F.S.; Seidel, G.M.; Torii, R.

    1991-01-01

    We have observed 5 MeV {alpha} particles stopped in volumes-up to two liters of liquid helium at 70 mK. A fraction of the kinetic energy of an {alpha} particle is converted to elementary excitations (rotons and phonons), which progagate ballistically in isotopically pure {sup 4}He below 0.1 K. Most of these excitations have sufficient energy to evaporate helium atoms on hitting a free surface. The evaporated helium atoms can be detected calorimetrically when adsorbed on a thin silicon wafer ({approximately}1.7 g, 35 cm{sup 2}) suspended above the liquid. Temperature changes of the silicon are measured with a NTD germanium bolometer. For the geometry studied the observed temperature change of the silicon resulting from an {alpha} event in the liquid is approximately 5% of the temperature rise from an {alpha} hitting the silicon directly. The implications of these measurements will be discussed as they relate to the possible construction of a large scale detector of solar neutrinos.

  11. Particle detection using superfluid helium

    SciTech Connect

    Bandler, S.R.; Lanou, R.E.; Maris, H.J.; More, T.; Porter, F.S.; Seidel, G.M.; Torii, R.

    1991-12-31

    We have observed 5 MeV {alpha} particles stopped in volumes-up to two liters of liquid helium at 70 mK. A fraction of the kinetic energy of an {alpha} particle is converted to elementary excitations (rotons and phonons), which progagate ballistically in isotopically pure {sup 4}He below 0.1 K. Most of these excitations have sufficient energy to evaporate helium atoms on hitting a free surface. The evaporated helium atoms can be detected calorimetrically when adsorbed on a thin silicon wafer ({approximately}1.7 g, 35 cm{sup 2}) suspended above the liquid. Temperature changes of the silicon are measured with a NTD germanium bolometer. For the geometry studied the observed temperature change of the silicon resulting from an {alpha} event in the liquid is approximately 5% of the temperature rise from an {alpha} hitting the silicon directly. The implications of these measurements will be discussed as they relate to the possible construction of a large scale detector of solar neutrinos.

  12. Ligand-induced Epitope Masking

    PubMed Central

    Mould, A. Paul; Askari, Janet A.; Byron, Adam; Takada, Yoshikazu; Jowitt, Thomas A.; Humphries, Martin J.

    2016-01-01

    We previously demonstrated that Arg-Gly-Asp (RGD)-containing ligand-mimetic inhibitors of integrins are unable to dissociate pre-formed integrin-fibronectin complexes (IFCs). These observations suggested that amino acid residues involved in integrin-fibronectin binding become obscured in the ligand-occupied state. Because the epitopes of some function-blocking anti-integrin monoclonal antibodies (mAbs) lie near the ligand-binding pocket, it follows that the epitopes of these mAbs may become shielded in the ligand-occupied state. Here, we tested whether function-blocking mAbs directed against α5β1 can interact with the integrin after it forms a complex with an RGD-containing fragment of fibronectin. We showed that the anti-α5 subunit mAbs JBS5, SNAKA52, 16, and P1D6 failed to disrupt IFCs and hence appeared unable to bind to the ligand-occupied state. In contrast, the allosteric anti-β1 subunit mAbs 13, 4B4, and AIIB2 could dissociate IFCs and therefore were able to interact with the ligand-bound state. However, another class of function-blocking anti-β1 mAbs, exemplified by Lia1/2, could not disrupt IFCs. This second class of mAbs was also distinguished from 13, 4B4, and AIIB2 by their ability to induce homotypic cell aggregation. Although the epitope of Lia1/2 was closely overlapping with those of 13, 4B4, and AIIB2, it appeared to lie closer to the ligand-binding pocket. A new model of the α5β1-fibronectin complex supports our hypothesis that the epitopes of mAbs that fail to bind to the ligand-occupied state lie within, or very close to, the integrin-fibronectin interface. Importantly, our findings imply that the efficacy of some therapeutic anti-integrin mAbs could be limited by epitope masking. PMID:27484800

  13. He reemission implanted in metals

    NASA Astrophysics Data System (ADS)

    Tanabe, T.

    2014-10-01

    Helium (He) reemission of Al, Ni and Mo under energetic He implantation (10-30 keV) in wide temperature range is studied to understand behavior of implanted He in correlation with structure changes. The reemission behavior is categorized into 4 different temperature ranges with the normalized temperature (Tm) to the melting point of each metal. At elevated temperatures (well above ∼0.6 Tm), interstitial He atoms and/or He-vacancy (ies) clusters can migrate remaining no structure change and showing smooth reemission without any burst. Between ∼0.25 and 0.6 Tm, He reemission always accompanies significant structure modification. For ∼04-0.6 Tm, implanted He coalesce to make bubbles and the bubbles can move to the surface. Bubble migration accompanies materials flow to the surface resulting in fuzz surface or columnar structure, depending on implantation flux. Slower bubble motion at ∼0.25-0.4 prohibits the material migration. Instead the bubbles coalesce to grow large and multi-layered blistering appears as periodic reemission behavior. Below ∼0.25 Tm, He migration is too slow for bubbles to grow large, but bubble density increases up to a certain fluence, where neighboring bubbles start to coalesce. Accordingly, He release is mostly caused by mechanical failure or blister rapture. With increasing fluence, all defects (bubbles and dislocation loops) tangle or inter connected with neighboring defects and accordingly He migration to the surface along the tangled or connected defects is enhanced, resulting 100% reemission easily without making multilayered blistering.

  14. Phase analysis of amplitude binary mask structures

    NASA Astrophysics Data System (ADS)

    Puthankovilakam, Krishnaparvathy; Scharf, Toralf; Herzig, Hans Peter; Vogler, Uwe; Bramati, Arianna; Voelkel, Reinhard

    2016-03-01

    Shaping of light behind masks using different techniques is the milestone of the printing industry. The aerial image distribution or the intensity distribution at the printing distances defines the resolution of the structure after printing. Contrast and phase are the two parameters that play a major role in shaping of light to get the desired intensity pattern. Here, in contrast to many other contributions that focus on intensity, we discuss the phase evolution for different structures. The amplitude or intensity characteristics of the structures in a binary mask at different proximity gaps have been analyzed extensively for many industrial applications. But the phase evolution from the binary mask having OPC structures is not considered so far. The mask we consider here is the normal amplitude binary mask but having high resolution Optical Proximity Correction (OPC) structures for corners. The corner structures represent a two dimensional problem which is difficult to handle with simple rules of phase masks design and therefore of particular interest. The evolution of light from small amplitude structures might lead to high contrast by creating sharp phase changes or phase singularities which are points of zero intensity. We show the phase modulation at different proximity gaps and can visualize the shaping of light according to the phase changes. The analysis is done with an instrument called High Resolution Interference Microscopy (HRIM), a Mach-Zehnder interferometer that gives access to three-dimensional phase and amplitude images. The current paper emphasizes on the phase measurement of different optical proximity correction structures, and especially on corners of a binary mask.

  15. Unconscious processing of dichoptically masked words.

    PubMed

    Greenwald, A G; Klinger, M R; Liu, T J

    1989-01-01

    In three experiments, the subjects' task was to decide whether each of a series of words connoted something good (e.g., fame, comedy, rescue) or bad (stress, detest, malaria). One-half second before the presentation of each such target word, an evaluatively polarized priming word was presented briefly to the nondominant eye and was masked dichoptically by either the rapidly following (Experiment 1) or simultaneous (Experiments 2 and 3) presentation of a random letter-fragment pattern to the dominant eye. (The effectiveness of the masking procedure was demonstrated by the subjects' inability to discriminate the left vs. right position of a test series of words.) In all experiments, significant masked priming effects were obtained; evaluative decisions to congruent masked prime-target combinations (such as a positive masked prime followed by a positive target) were significantly faster than those to incongruent (e.g., negative prime/positive target) or noncongruent (e.g., neutral prime/positive target) combinations. Also, in two of the three experiments, when subjects were at chance accuracy in discriminating word position, their position judgments were nevertheless significantly influenced by the irrelevant semantic content (LEFT vs. RIGHT) of the masked position-varying words. The series of experiments demonstrated that two very different tasks--speeded judgment of evaluative meaning and nonspeeded judgment of word position--yielded statistically significant and replicable influences of the semantic content of apparently undetectable words. Coupled with previous research by others using the lexical decision task, these findings converge in establishing the reliability of the empirical phenomenon of semantic processing of words that are rendered undetectable by dichoptic pattern masking.

  16. An experimental investigation of the aeroacoustic properties of high-speed, helium/air mixture axisymmetric jets

    NASA Astrophysics Data System (ADS)

    Doty, Michael Justin

    The acoustic and aerodynamic properties of high-speed axisymmetric jets are investigated experimentally in a recently refurbished high-speed jet noise facility. Mach numbers from 0.5 to 1.5 are tested with an emphasis on Mach 0.9 and 1.5 jets. Reynolds numbers for the current study range from approximately 200,000 to 600,000. The properties of heated jets which are important in aeroacoustic studies, namely low density and high velocity, are simulated in the current study by adding helium to the jet flow. In addition, an optical deflectometry system is used to provide unique two-point space-time correlation measurements within the jet shear layer. A combination of acoustic, mean flow, and optical deflectometry measurements are made for both pure air and helium/air mixture jets at various helium concentrations. Far-field acoustic measurements indicate very reasonable agreement between previously measured heated jet directivity patterns and those at simulated temperature ratios using helium/air mixture jets. The addition of helium also shows strong similarities to the addition of heat in the mean velocity profile measurements. A shortening of the potential core and a slight decrease in jet spreading rate are observed with helium addition---the same trends observed for heated jets. Optical deflectometry measurements near the end of the potential core along the jet lip line exhibit distinct cross-correlation curves for the pure air jet cases. However, helium/air mixture jets display much lower levels of correlation and little evidence of large-scale structure in the measured spectra. It is believed the strong visual density gradients throughout the shear layer effectively mask the large-scale structure, thus reflecting a limitation of the optical deflectometer. Finally, a decrease in normalized convection velocity with simulated heating (helium addition) is observed.

  17. Variation in Atmospheric Helium Isotopes

    NASA Astrophysics Data System (ADS)

    Mabry, J. C.; Marty, B.; Burnard, P.; Blard, P.

    2010-12-01

    Anthropogenic activity such as oil and gas exploitation releases crustal helium, which has excess 4He compared to atmospheric helium. This may give rise to both spatial and temporal variations in the atmospheric 3He/4He. Helium is present in trace quantities in the air (5 ppm) and has a very low ratio (3He/4Heair = 1.38 x 10-6), consequently high precision measurements of atmospheric He presents a significant analytical challenge. Recent work by Sano et al. [1] has endeavored to experimentally quantify these potential variations in the atmospheric 3He/4He by measuring the helium isotopes from air samples collected around the globe and from samples of ancient trapped atmosphere. Their results indicate an increase in the atmospheric 3He/4He from northern to southern latitudes of the order 2 - 4 ‰, which they attribute to greater use of fossil fuels in the northern hemisphere. However, since most of their data points overlap at the 2-3 ‰ (2σ) level, additional measurements (with increased precision if possible) are needed. We have constructed an automated extraction line dedicated to measuring He in samples of air which can rapidly switch between measuring aliquots of sample with standards. It additionally features an adjustable bellows on the sample aliquot volume that enables us to adjust the size of a sample aliquot to precisely match the standard, eliminating biases arising from nonlinear pressure effects in the mass spectrometer. The measurements are made using a Helix SFT multi-collector mass spectrometer. At present, repeat measurements of 3He/4He from our standard (purified air) have a reproducibility of 2‰ (2σ), while measurements of local (Nancy, France) air samples have a reproducibility of 3He/4He of 3‰ (2σ), which are at a similar level to the uncertainties reported by Sano. Modifications are underway to improve 3He measurements which are the principal source of error. We have collected atmospheric samples from around the globe over a wide

  18. Investigations of levitated helium drops

    NASA Astrophysics Data System (ADS)

    Whitaker, Dwight Lawrence

    1999-11-01

    We report on the development of two systems capable of levitating drops of liquid helium. Helium drops of ˜20 mum have been levitated with the radiation pressure from two counter-propagating Nd:YAG laser beams. Drops are produced with a submerged piezoelectric transducer, and could be held for up to three minutes in our optical trap. Calculations show that Brillouin and Raman scattering of the laser light in the liquid helium produces a negligible rate of evaporation of the drop. Evaporation caused by the enhanced vapor pressure of the curved drop surfaces appears to be a significant effect limiting the drop lifetimes. Helium drops as large as 2 cm in diameter have been suspended in the earth's gravitational field with a magnetic field. A commercial superconducting solenoid provides the necessary field, field-gradient product required to levitate the drops. Drops are cooled to 0.5 K with a helium-3 refrigerator, and can be held in the trap indefinitely. We have found that when two or more drops are levitated in the same magnetic trap, the drops often remain in a state of apparent contact without coalescing. This effect is a result of the evaporation of liquid from between the two drops, and is found to occur only for normal fluid drops. We can induce shape oscillations in charged, levitated drops with an applied ac electric field. We have measured the resonance frequencies and damping rates for the l = 2 mode of oscillation as function of temperature. We have also developed a theory to describe the small amplitude shape oscillations of a He II drop surrounded by its saturated vapor. In our theory, we have considered two sets of boundary conditions---one where the drop does not evaporate and another in which the liquid and vapor are in thermodynamic equilibrium. We have found that both solutions give a frequency that agrees well with experiment, but that the data for the damping rate agree better with the solution without evaporation.

  19. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    ERIC Educational Resources Information Center

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  20. Critical Landau velocity in helium nanodroplets.

    PubMed

    Brauer, Nils B; Smolarek, Szymon; Loginov, Evgeniy; Mateo, David; Hernando, Alberto; Pi, Marti; Barranco, Manuel; Buma, Wybren J; Drabbels, Marcel

    2013-10-11

    The best-known property of superfluid helium is the vanishing viscosity that objects experience while moving through the liquid with speeds below the so-called critical Landau velocity. This critical velocity is generally considered a macroscopic property as it is related to the collective excitations of the helium atoms in the liquid. In the present work we determine to what extent this concept can still be applied to nanometer-scale, finite size helium systems. To this end, atoms and molecules embedded in helium nanodroplets of various sizes are accelerated out of the droplets by means of optical excitation, and the speed distributions of the ejected particles are determined. The measurements reveal the existence of a critical velocity in these systems, even for nanodroplets consisting of only a thousand helium atoms. Accompanying theoretical simulations based on a time-dependent density functional description of the helium confirm and further elucidate this experimental finding.

  1. On charged impurity structures in liquid helium

    NASA Astrophysics Data System (ADS)

    Pelmenev, A. A.; Krushinskaya, I. N.; Bykhalo, I. B.; Boltnev, R. E.

    2016-03-01

    The thermoluminescence spectra of impurity-helium condensates (IHC) submerged in superfluid helium have been observed for the first time. Thermoluminescence of impurity-helium condensates submerged in superfluid helium is explained by neutralization reactions occurring in impurity nanoclusters. Optical spectra of excited products of neutralization reactions between nitrogen cations and thermoactivated electrons were rather different from the spectra observed at higher temperatures, when the luminescence due to nitrogen atom recombination dominates. New results on current detection during the IHC destruction are presented. Two different mechanisms of nanocluster charging are proposed to describe the phenomena observed during preparation and warm-up of IHC samples in bulk superfluid helium, and destruction of IHC samples out of liquid helium.

  2. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 1 2014-10-01 2014-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  3. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 1 2012-10-01 2011-10-01 true Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  4. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 1 2013-10-01 2013-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  5. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 43 Public Lands: Interior 1 2010-10-01 2010-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  6. 43 CFR 16.2 - Applications for helium disposition agreements.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 1 2011-10-01 2011-10-01 false Applications for helium disposition... HELIUM § 16.2 Applications for helium disposition agreements. The application for a helium disposition... Secretary to determine that the proposal will conserve helium that will otherwise be wasted, drained,...

  7. Mask and lithography techniques for FPD

    NASA Astrophysics Data System (ADS)

    Sandstrom, T.; Wahlsten, M.; Sundelin, E.; Hansson, G.; Svensson, A.

    2015-09-01

    Large-field projection lithography for FPDs has developed gradually since the 90s. The LCD screen technology has remained largely unchanged and incremental development has given us better image quality, larger screen sizes, and above all lower cost per area. Recently new types of mobile devices with very high pixel density and/or OLED displays have given rise to dramatically higher requirem ents on photomask technology. Devices with 600 ppi or m ore need lithography with higher optical resolution and better linewidth control. OLED di splays pose new challenges with high sensitivity to transistor parameters and to capacitive cross-talk. New mask requirements leads to new maskwriter requirements and Mycronic has developed a new generation of large -area mask writers with significantly improved properties. This paper discusses and shows data for the improved writers. Mask production to high er quality stan dards also need metrology to verify the quality and Mycronic has introduced a 2D metrology tool with accuracy adequate for current and future masks. New printing or additive methods of producing disp lays on plastic or metal foil will make low-cost disp lays available. This inexpensive type of disp lays will exist side by side with the photographic quality displays of TVs and mobile devices, which will continue to be a challenge in terms of mask and production quality.

  8. Calculating aerial images from EUV masks

    NASA Astrophysics Data System (ADS)

    Pistor, Thomas V.; Neureuther, Andrew R.

    1999-06-01

    Aerial images for line/space patterns, arrays of posts and an arbitrary layout pattern are calculated for EUV masks in a 4X EUV imaging system. Both mask parameters and illumination parameters are varied to investigate their effects on the aerial image. To facilitate this study, a parallel version of TEMPEST with a Fourier transform boundary condition was developed and run on a network of 24 microprocessors. Line width variations are observed when absorber thickness or sidewall angle changes. As the line/space pattern scales to smaller dimensions, the aspect ratios of the absorber features increase, introducing geometric shadowing and reducing aerial image intensity and contrast. 100nm square posts have circular images of diameter close to 100nm, but decreasing in diameter significantly when the corner round radius at the mask becomes greater than 50 nm. Exterior mask posts image slightly smaller and with higher ellipticity than interior mask posts. The aerial image of the arbitrary test pattern gives insight into the effects of the off-axis incidence employed in EUV lithography systems.

  9. Metrology on phase-shift masks

    NASA Astrophysics Data System (ADS)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  10. EUV mask process specifics and development challenges

    NASA Astrophysics Data System (ADS)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  11. Light masking in the field: an experiment with nocturnal and diurnal spiny mice under semi-natural field conditions.

    PubMed

    Rotics, Shay; Dayan, Tamar; Levy, Ofir; Kronfeld-Schor, Noga

    2011-02-01

    Light masking has been studied almost exclusively in the laboratory. The authors populated four field enclosures with locally coexisting nocturnal Acomys cahirinus and diurnal A. russatus, and monitored their body temperatures (T(b)) using implanted temperature-sensitive radio transmitters. A 3-h light pulse was initiated at the beginning of two consecutive nights; preceding nights were controls. A. cahirinus T(b) and calculated activity levels decreased significantly during the light pulse, demonstrating a negative light masking response (light effect on T(b): -0.32 °C ± 0.15 °C; average calculated activity records during the light pulse: 7 ± 1.53, control: 9.8 ± 1.62). Diurnal A. russatus did not respond to the light pulse. We conclude that light masking is not an artifact of laboratory conditions but represents a natural adaptive response in free-living populations.

  12. Stack effect implementation in OPC and mask verification for production environment

    NASA Astrophysics Data System (ADS)

    Sungauer, Elodie; Robert, Frederic

    2012-03-01

    With the decrease of the transistors dimensions, process steps usually considered as not critical become challenging. This is the case for implant levels patterning, which can be strongly impacted by reflections from the underlying active and gate patterns, especially when no anti-reflective coating can be used. This stack effect leads to unexpected resist shape on wafer if not taken into account during OPC flow. We propose a solution to integrate stack effect onto existing OPC models by adding fictive layers at mask level in order to allow a stack-aware OPC or mask verification. This method can be implemented in a standard OPC flow offered by EDA OPC software. It provides effective results compatible with production constrains, such as stack-aware full chip simulation and run time efficiency.

  13. Energy, helium, and the future: II

    SciTech Connect

    Krupka, M.C.; Hammel, E.F.

    1980-01-01

    The importance of helium as a critical resource material has been recognized specifically by the scientific community and more generally by the 1960 Congressional mandate to institute a long-range conservation program. A major study mandated by the Energy Reorganization Act of 1974 resulted in the publication in 1975 of the document, The Energy-Related Applications of Helium, ERDA-13. This document contained a comprehensive review and analysis relating to helium resources and present and future supply/demand relationships with particular emphasis upon those helium-dependent energy-related technologies projected to be implemented in the post-2000 year time period, e.g., fusion. An updated overview of the helium situation as it exists today is presented. Since publication of ERDA-13, important changes in the data base underlying that document have occurred. The data have since been reexamined, revised, and new information included. Potential supplies of helium from both conventional and unconventional natural gas resources, projected supply/demand relationships to the year 2030 based upon a given power-generation scenario, projected helium demand for specific energy-related technologies, and the supply options (national and international) available to meet that demand are discussed. An updated review will be given of the energy requirements for the extraction of helium from natural gas as they relate to the concentration of helium. A discussion is given concerning the technical and economic feasibility of several methods available both now and conceptually possible, to extract helium from helium-lean natural gas, the atmosphere, and outer space. Finally, a brief review is given of the 1980 Congressional activities with respect to the introduction and possible passage of new helium conservation legislation.

  14. Helium isotopic abundance variation in nature

    SciTech Connect

    Holden, N.E.

    1993-08-01

    The isotopic abundance of helium in nature has been reviewed. This atomic weight value is based on the value of helium in the atmosphere, which is invariant around the world and up to a distance of 100,000 feet. Helium does vary in natural gas, volcanic rocks and gases, ocean floor sediments, waters of various types and in radioactive minerals and ores due to {alpha} particle decay of radioactive nuclides.

  15. Imaging of tritium implanted into graphite

    SciTech Connect

    Malinowski, M.E.; Causey, R.A.

    1988-05-01

    The extensive use of graphite in plasma-facing surfaces of tokamaks such as the Tokamak Fusion Test Reactor, which has planned tritium discharges, makes two-dimensional tritium detection techniques important in helping to determine torus tritium inventories. We have performed experiments in which highly oriented pyrolytic graphite (HOPG) samples were first tritium implanted with fluences of approx.10/sup 16/ T/cm/sup 2/ at energies approx. <25 eV and then the near-surface implant distributions were detected in two dimensions using tritium imaging. A portion of the sample was masked off during the implant in order to produce a well-defined implant boundary. Heating of the HOPG samples to temperatures as high as 500 /sup 0/C resulted in no discernible motion of tritium along the basal plane, but did show that significant desorption of the implanted tritium occurred. The current results indicate that tritium in quantities of 10/sup 12/ T/cm/sup 2/ in tritiated components could be readily detected by imaging at lower magnifications.

  16. Radioactive transitions in the helium isoelectronic sequence

    NASA Technical Reports Server (NTRS)

    Dalgarno, A.

    1971-01-01

    The principles of the atomic spectrum theory are used to quantitatively analyze radiation transitions in two-electron helium-like atomic systems. Quantum theoretical methods, describing absorption and emission of a single photon in a radiative transition between two stationary states of an atomic system, reproduced the energy level diagram for the low lying states of helium. Reliable values are obtained from accurate variationally determined two-electron nonrelativistic wave functions for radiative transition probabilities of 2 3p states in the helium isoelectric sequence, and for the 2 1s and 2 3s1 states of the helium sequence.

  17. Helium transport studies on DIII-D

    SciTech Connect

    Finkenthal, D.F.; Hillis, D.L.; Wade, M.R.; Hogan, J.T.; Klepper, C.C.; Mioduszewski, P.K.; West, W.P.; Burrell, K.H.; Seraydarian, R.P.; Groebner, R.J.; Gohil, P.

    1992-05-01

    The measurement of Helium density profiles in tokamak plasmas is necessary for helium transport studies. These studies are important in predicting the helium ash transport properties for ITER and win have important implications for the design. Poor helium transport in reactors could lead to a buildup of fusion ash, causing fuel dilution and increased radiation that will result in degraded fusion power and possibly quench ignition altogether. Present estimates indicate that He concentrations in the core must be kept below 10% in order to maintain continuous reactor operation. Helium transport studies have begun on the DM-D tokamak using charge exchange recombination (CER) spectroscopy for helium density measurements. Helium transport behavior has been observed by injecting helium gas puffs into DM-D plasmas and measuring the He density profile evolution. The profiles are used to calculate the relevant helium transport properties. This paper covers the results obtained from puffing He gas into L-mode plasmas of various electron densities. The results obtained in DIII-D L-mode plasmas are similar to measurements made at TEXTOR and JT-60.

  18. Observations of solar-wind helium

    NASA Technical Reports Server (NTRS)

    Neugebauer, M.

    1981-01-01

    It is pointed out that the concentration of helium in the solar wind relative to hydrogen fluctuates wildly. Under certain circumstances, the helium to hydrogen abundance ratio is strongly enhanced over probable solar values; at other times, the amount of helium in the solar wind is immeasurably small. In spite of the fact that helium is heavier than hydrogen, solar-wind helium often leaves the solar gravitational field with a higher velocity than does the hydrogen. It is thought that the mechanisms responsible for helium behavior may contain clues to unanswered questions concerning the acceleration and energy exchange processes of the entire solar wind. A brief review is given of the principal features and theories of the solar wind as a whole. In addition, measurement techniques are discussed. Emphasis throughout is on the experimental data concerning the dynamics of solar-wind helium. On the basis of coronal temperatures, it is shown that helium in the solar wind is almost always doubly ionized. It is also shown that the average abundance of helium ions in the solar wind is usually in the range of 3 to 6% by number.

  19. Helium-3 emission related to volcanic activity

    SciTech Connect

    Sano, Y.; Nakamura, Y.; Wakita, H.; Urabe, A.; Tominaga, T.

    1984-04-13

    The helium-3/helium-4 ratio in bubbling gases from ten hot springs located around Mount Ontake, an active volcano in central Japan, ranges from 1.71 R/sub atm/ (1.71 times the atmospheric ratio of 1.40 x 10/sup -6/) to 6.15 R/sub atm/. The value of the ratio decreases with distance from the central cone of the volcano. Such a tendency may be a characteristic of helium-3 emission in volcanic areas and suggests more primitive helium-3 is carried with fluid flowing through a conduit during volcanic activity. 6 references, 1 figure, 1 table.

  20. Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C

    NASA Astrophysics Data System (ADS)

    Chen, C.-H.; Zhang, Y.; Wang, Y.; Crespillo, M. L.; Fontana, C. L.; Graham, J. T.; Duscher, G.; Shannon, S. C.; Weber, W. J.

    2016-04-01

    Knowledge of radiation-induced helium bubble nucleation and growth in SiC is essential for applications in fusion and fission environments. Here we report the evolution of microstructure in nano-engineered (NE) 3C SiC, pre-implanted with helium, under heavy ion irradiation at 700 °C up to doses of 30 displacements per atom (dpa). Elastic recoil detection analysis confirms that the as-implanted helium depth profile does not change under irradiation to 30 dpa at 700 °C. While the helium bubble size distribution becomes narrower with increasing dose, the average size of bubbles remains unchanged and the density of bubbles increases somewhat with dose. These results are consistent with a long helium bubble incubation process under continued irradiation at 700 °C up to 30 dpa, similar to that reported under dual and triple beam irradiation at much higher temperatures. The formation of bubbles at this low temperature is enhanced by the nano-layered stacking fault structure in the NE SiC, which enhances point defect mobility parallel to the stacking faults. This stacking fault structure is stable at 700 °C up to 30 dpa and suppresses the formation of dislocation loops normally observed under these irradiation conditions.

  1. Dose dependence of helium bubble formation in nano-engineered SiC at 700 °C

    DOE PAGES

    Chen, Chien -Hung; Zhang, Yanwen; Wang, Yongqiang; Crespillo, Miguel L.; Fontana, Cristiano L.; Graham, Joseph T.; Duscher, Gerd; Shannon, Steven C.; Weber, William J.

    2016-02-03

    Knowledge of radiation-induced helium bubble nucleation and growth in SiC is essential for applications in fusion and fission environments. Here we report the evolution of microstructure in nano-engineered (NE) 3C SiC, pre-implanted with helium, under heavy ion irradiation at 700 °C up to doses of 30 displacements per atom (dpa). Elastic recoil detection analysis confirms that the as-implanted helium depth profile does not change under irradiation to 30 dpa at 700 °C. While the helium bubble size distribution becomes narrower with increasing dose, the average size of bubbles remains unchanged and the density of bubbles increases somewhat with dose. Thesemore » results are consistent with a long helium bubble incubation process under continued irradiation at 700 °C up to 30 dpa, similar to that reported under dual and triple beam irradiation at much higher temperatures. The formation of bubbles at this low temperature is enhanced by the nano-layered stacking fault structure in the NE SiC, which enhances point defect mobility parallel to the stacking faults. Here, this stacking fault structure is stable at 700 °C up to 30 dpa and suppresses the formation of dislocation loops normally observed under these irradiation conditions.« less

  2. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  3. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  4. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  5. 43 CFR 3195.35 - What happens if I have an outstanding obligation to purchase refined helium under a Helium...

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... obligation to purchase refined helium under a Helium Distribution Contract? 3195.35 Section 3195.35 Public... OF THE INTERIOR MINERALS MANAGEMENT (3000) HELIUM CONTRACTS Federal Helium Supplier Requirements § 3195.35 What happens if I have an outstanding obligation to purchase refined helium under a...

  6. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... 43 Public Lands: Interior 2 2014-10-01 2014-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  7. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... 43 Public Lands: Interior 2 2013-10-01 2013-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  8. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 43 Public Lands: Interior 2 2012-10-01 2012-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  9. 43 CFR 3195.20 - Who must purchase major helium requirements from Federal helium suppliers?

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 43 Public Lands: Interior 2 2011-10-01 2011-10-01 false Who must purchase major helium requirements from Federal helium suppliers? 3195.20 Section 3195.20 Public Lands: Interior Regulations Relating... (3000) HELIUM CONTRACTS Federal Agency Requirements § 3195.20 Who must purchase major...

  10. Understanding speech in modulated interference: Cochlear implant users and normal-hearing listeners

    NASA Astrophysics Data System (ADS)

    Nelson, Peggy B.; Jin, Su-Hyun; Carney, Arlene Earley; Nelson, David A.

    2003-02-01

    Many competing noises in real environments are modulated or fluctuating in level. Listeners with normal hearing are able to take advantage of temporal gaps in fluctuating maskers. Listeners with sensorineural hearing loss show less benefit from modulated maskers. Cochlear implant users may be more adversely affected by modulated maskers because of their limited spectral resolution and by their reliance on envelope-based signal-processing strategies of implant processors. The current study evaluated cochlear implant users' ability to understand sentences in the presence of modulated speech-shaped noise. Normal-hearing listeners served as a comparison group. Listeners repeated IEEE sentences in quiet, steady noise, and modulated noise maskers. Maskers were presented at varying signal-to-noise ratios (SNRs) at six modulation rates varying from 1 to 32 Hz. Results suggested that normal-hearing listeners obtain significant release from masking from modulated maskers, especially at 8-Hz masker modulation frequency. In contrast, cochlear implant users experience very little release from masking from modulated maskers. The data suggest, in fact, that they may show negative effects of modulated maskers at syllabic modulation rates (2-4 Hz). Similar patterns of results were obtained from implant listeners using three different devices with different speech-processor strategies. The lack of release from masking occurs in implant listeners independent of their device characteristics, and may be attributable to the nature of implant processing strategies and/or the lack of spectral detail in processed stimuli.

  11. Communication masking in marine mammals: A review and research strategy.

    PubMed

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals.

  12. Metacontrast masking is processed before grapheme-color synesthesia.

    PubMed

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  13. Procedural Factors That Affect Psychophysical Measures of Spatial Selectivity in Cochlear Implant Users.

    PubMed

    Cosentino, Stefano; Deeks, John M; Carlyon, Robert P

    2015-01-01

    Behavioral measures of spatial selectivity in cochlear implants are important both for guiding the programing of individual users' implants and for the evaluation of different stimulation methods. However, the methods used are subject to a number of confounding factors that can contaminate estimates of spatial selectivity. These factors include off-site listening, charge interactions between masker and probe pulses in interleaved masking paradigms, and confusion effects in forward masking. We review the effects of these confounds and discuss methods for minimizing them. We describe one such method in which the level of a 125-pps masker is adjusted so as to mask a 125-pps probe, and where the masker and probe pulses are temporally interleaved. Five experiments describe the method and evaluate the potential roles of the different potential confounding factors. No evidence was obtained for off-site listening of the type observed in acoustic hearing. The choice of the masking paradigm was shown to alter the measured spatial selectivity. For short gaps between masker and probe pulses, both facilitation and refractory mechanisms had an effect on masking; this finding should inform the choice of stimulation rate in interleaved masking experiments. No evidence for confusion effects in forward masking was revealed. It is concluded that the proposed method avoids many potential confounds but that the choice of method should depend on the research question under investigation. PMID:26420785

  14. Procedural Factors That Affect Psychophysical Measures of Spatial Selectivity in Cochlear Implant Users

    PubMed Central

    Deeks, John M.; Carlyon, Robert P.

    2015-01-01

    Behavioral measures of spatial selectivity in cochlear implants are important both for guiding the programing of individual users’ implants and for the evaluation of different stimulation methods. However, the methods used are subject to a number of confounding factors that can contaminate estimates of spatial selectivity. These factors include off-site listening, charge interactions between masker and probe pulses in interleaved masking paradigms, and confusion effects in forward masking. We review the effects of these confounds and discuss methods for minimizing them. We describe one such method in which the level of a 125-pps masker is adjusted so as to mask a 125-pps probe, and where the masker and probe pulses are temporally interleaved. Five experiments describe the method and evaluate the potential roles of the different potential confounding factors. No evidence was obtained for off-site listening of the type observed in acoustic hearing. The choice of the masking paradigm was shown to alter the measured spatial selectivity. For short gaps between masker and probe pulses, both facilitation and refractory mechanisms had an effect on masking; this finding should inform the choice of stimulation rate in interleaved masking experiments. No evidence for confusion effects in forward masking was revealed. It is concluded that the proposed method avoids many potential confounds but that the choice of method should depend on the research question under investigation. PMID:26420785

  15. Carbon contamination topography analysis of EUV masks

    SciTech Connect

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  16. Free electron laser with masked chicane

    DOEpatents

    Nguyen, Dinh C.; Carlsten, Bruce E.

    1999-01-01

    A free electron laser (FEL) is provided with an accelerator for outputting electron beam pulses; a buncher for modulating each one of the electron beam pulses to form each pulse into longitudinally dispersed bunches of electrons; and a wiggler for generating coherent light from the longitudinally dispersed bunches of electrons. The electron beam buncher is a chicane having a mask for physically modulating the electron beam pulses to form a series of electron beam bunches for input to the wiggler. In a preferred embodiment, the mask is located in the chicane at a position where each electron beam pulse has a maximum dispersion.

  17. Superfluid Helium Tanker (SFHT) study

    NASA Technical Reports Server (NTRS)

    1988-01-01

    The accomplishments and recommendations of the two-phase Superfluid Helium Tanker (SFHT) study are presented. During the first phase of the study, the emphasis was on defining a comprehensive set of user requirements, establishing SFHT interface parameters and design requirements, and selecting a fluid subsystem design concept. During the second phase, an overall system design concept was constructed based on appropriate analyses and more detailed definition of requirements. Modifications needed to extend the baseline for use with cryogens other than SFHT have been determined, and technology development needs related to the recommended design have been assessed.

  18. Helium in Earth's Early Core

    NASA Astrophysics Data System (ADS)

    Jephcoat, A. P.; Bouhifd, M. A.; Heber, V.; Kelley, S. P.

    2006-12-01

    The high 3He/4He ratios for some ocean-island basalts, and more recent observations for solar components of the other rare gases (Ne, Ar and possibly Xe), continue to raise questions on primordial source reservoirs as well as on accretionary and incorporation processes of rare gases. A number of geochemical mantle models have been made to explain the observed 3He/4He ratios, the most popular of which has been an undegassed primordial reservoir. Isotope systematics of other radiogenic elements do not support such an isolated source and changes in the accepted models of mantle convection style have made it harder to rely on the deep mantle as a reservoir. The core has remained a particularly unfavourable location either because of difficulty in constructing a retention mechanism during planetary accretion or simply because of a lack of data: Partitioning studies at pressure are rare and complicated by the difficulty in reproducing not only absolute concentrations, but confinement of gas in high-pressure apparatus and post-run analysis. We present experiments on helium solubility and partitioning between molten silicates and Fe-rich metal liquids up to 16 GPa and 3000 K, with the laser-heated diamond-anvil cell, and the quenched run products analysed by ultra-violet laser ablation mass spectrometry (UVLAMP). Our results indicate a significantly higher partition coefficient for He between molten silicates and Fe-rich alloy liquids of about 10-2 at 16 GPa and 3000~K -- two orders of magnitude more helium is measured in the metal phase compared to the only previous data of Matsuda et al., (1993). The solubility mechanism is varied and involves a distinguishable bulk component and an apparent surface signature (that may be the result of the quench process). Whether surface effects are included or not, the early Earth's core would have incorporated non-negligible amounts of primordial helium if its segregation took place under mid-depth, magma-ocean conditions. The process

  19. Helium bubble bursting in tungsten

    SciTech Connect

    Sefta, Faiza; Juslin, Niklas; Wirth, Brian D.

    2013-12-28

    Molecular dynamics simulations have been used to systematically study the pressure evolution and bursting behavior of sub-surface helium bubbles and the resulting tungsten surface morphology. This study specifically investigates how bubble shape and size, temperature, tungsten surface orientation, and ligament thickness above the bubble influence bubble stability and surface evolution. The tungsten surface is roughened by a combination of adatom “islands,” craters, and pinholes. The present study provides insight into the mechanisms and conditions leading to various tungsten topology changes, which we believe are the initial stages of surface evolution leading to the formation of nanoscale fuzz.

  20. Helium and neon abundances and compositions in cometary matter.

    PubMed

    Marty, Bernard; Palma, Russell L; Pepin, Robert O; Zimmermann, Laurent; Schlutter, Dennis J; Burnard, Peter G; Westphal, Andrew J; Snead, Christopher J; Bajt, Sasa; Becker, Richard H; Simones, Jacob E

    2008-01-01

    Materials trapped and preserved in comets date from the earliest history of the solar system. Particles captured by the Stardust spacecraft from comet 81P/Wild 2 are indisputable cometary matter available for laboratory study. Here we report measurements of noble gases in Stardust material. Neon isotope ratios are within the range observed in "phase Q," a ubiquitous, primitive organic carrier of noble gases in meteorites. Helium displays 3He/4He ratios twice those in phase Q and in Jupiter's atmosphere. Abundances per gram are surprisingly large, suggesting implantation by ion irradiation. The gases are probably carried in high-temperature igneous grains similar to particles found in other Stardust studies. Collectively, the evidence points to gas acquisition in a hot, high ion-flux nebular environment close to the young Sun.

  1. Helium and Neon Abundances and Compositions in Cometary Matter

    SciTech Connect

    Marty, B; Palma, R L; Pepin, R O; Zimmmermann, L; Schlutter, D J; Burnard, P G; Westphal, A J; Snead, C J; Bajt, S; Becker, R H; Simones, J E

    2007-10-15

    Materials trapped and preserved in comets date from the earliest history of the solar system. Particles captured by the Stardust spacecraft from comet Wild 2 are indisputable cometary matter available for laboratory study. Here they report measurements of noble gases in Stardust material. neon isotope ratios are within the range observed in 'phase Q', a ubiquitous, primitive organic carrier of noble gases in meteorites. Helium displays {sup 3}He/{sup 4}He ratios twice those in phase Q and in Jupiter's atmosphere. Abundances per gram are surprisingly large, suggesting implantation by ion irradiation. The gases are carried in high temperature igneous grains similar to particles found in other Stardust studies. Collectively the evidence points to gas acquisition in a hot, high ion flux nebular environment close to the young Sun.

  2. Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

    NASA Astrophysics Data System (ADS)

    Chen, George; Wiley, James N.; Wang, Jen-Shiang; Howell, Rafael C.; Bai, Shufeng; Chen, Yi-Fan; Chen, Frank; Cao, Yu; Takigawa, Tadahiro; Kurosawa, Terunobu; Tsuchiya, Hideo; Usuda, Kinya; Tokita, Masakazu; Ozaki, Fumio; Kikuiri, Nobutaka; Tsuji, Yoshitake

    2009-04-01

    We report the development of Mask-LMC for defect printability evaluation from sub-200nm wavelength mask inspection images. Both transmitted and reflected images are utilized, and both die-to-die and die-to-database inspection modes are supported. The first step of the process is to recover the patterns on the mask from high resolution T and R images by de-convolving inspection optical effects. This step uses a mask reconstruction model, which is based on rigorous Hopkins-modeling of the inspection optics, and is pre-determined before the full mask inspection. After mask reconstruction, wafer scanner optics and wafer resist simulations are performed on the reconstructed mask, with a wafer lithography model. This step leverages Brion's industry-proven, hardware-accelerated LMC (Lithography Manufacturability Check) technology1. Existing litho process models that are in use for Brion's OPC+ and verification products may be used for this simulation. In the final step, special detectors are used to compare simulation results on the reference and defect dice. We have developed detectors for contact CD, contact area, line and space CD, and edge placement errors. The detection result has been validated with AIMSTM.

  3. Peak oxygen consumption and lactate threshold in full mask versus mouth mask conditions during incremental exercise.

    PubMed

    Dooly, C R; Johnson, A T; Dotson, C O; Vaccaro, P; Soong, P

    1996-01-01

    Respirator masks vary in inhalation and exhalation resistance, and in dead volume. It is believed that these factors may contribute significantly to an early anaerobic threshold in mask wearers during maximal exercise. Very little is known concerning the effect of respirator masks on maximal oxygen consumption (VO2max) and the lactate threshold (LT). The purpose of the present study was to assess peak VO2 (VO2peak), LT and the ventilatory threshold (VT) of 14 experienced cyclists performing two maximal cycle exercise protocols while wearing a full respirator mask (FM) (M17 type) and a mouth mask (MM). VO2peak was 10% lower under FM conditions. Peak values for ventilation (VEpeak), respiratory rate (fbpeak) and tidal volume (VTpeak) were all significantly lower under with FM versus MM conditions. Performance time and maximal heart rate (fcpeak) were not different between mask conditions. The LT and VT when expressed in %VO2peak, and the lactate concentration (mmol.l-1) at LT and VT were not significantly different across mask conditions. Bland-Altman plots demonstrated longer inhalation times, decreased Fr values and greater oxygen extraction under FM conditions. Thus, perhaps due to the increased inhalation resistance of the FM condition, subjects were unable to attain their "normal" VO2 despite similar performance times and maximal fc. Furthermore, despite a diminished VO2peak with FM, LT and VT appeared to be the same as with a MM.

  4. Helium isotope geochemistry of some volcanic rocks from Saint Helena

    NASA Astrophysics Data System (ADS)

    Graham, David W.; Humphris, Susan E.; Jenkins, William J.; Kurz, Mark D.

    1992-05-01

    3He/ 4He ratios have been measured for olivine and clinopyroxene phenocrysts in 7-15 m.y. old basaltic lavas from the island of St. Helena. Magmatic helium was effectively resolved from post-eruptive radiogenic helium by employing various extraction techniques, including in vacuo crushing, and stepwise heating or fusion of the powders following crushing. The inherited 3He/ 4He ratio at St. Helena is 4.3-5.9 R A. Helium isotope disequilibrium is present within the phenocrysts, with lower 3He/ 4He upon heating and fusion of the powders following crushing, due to radiogenic ingrowth or to α-particle implantation from the surrounding (U + Th)-rich lavas. A single crushing analysis for clinopyroxene in a basalt from Tubuaii gave 3He/ 4He= 7.1 R A. 3He/ 4He ratios at St. Helena and Tubuaii (HIMU hotspots characterized by radiogenic Pb isotope signatures) are similar to 3He/ 4He ratios previously measured at Tristan da Cunha and Gough Island (EM hotspots characterized by low 206Pb/ 204Pb ). Overall, the He sbnd Sr sbnd Pb isotope systematics at these islands are consistent with a mantle origin as contiguous, heterogeneous materials, such as recycled crust and/or lithosphere. 3He/ 4He ratios at HIMU hotspots are similar to mantle xenoliths which display nearly the entire range of Pb isotope compositions found at ocean islands, and are only slightly less than values found in mid-ocean ridge basalts (7-9 R A). This suggests that the recycled materials were injected into the mantle within the last 10 9 yrs.

  5. Cosmic Ballet or Devil's Mask?

    NASA Astrophysics Data System (ADS)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  6. Are Masking-Based Models of Risk Useful?

    PubMed

    Gisiner, Robert C

    2016-01-01

    As our understanding of directly observable effects from anthropogenic sound exposure has improved, concern about "unobservable" effects such as stress and masking have received greater attention. Equal energy models of masking such as power spectrum models have the appeal of simplicity, but do they offer biologically realistic assessments of the risk of masking? Data relevant to masking such as critical ratios, critical bandwidths, temporal resolution, and directional resolution along with what is known about general mammalian antimasking mechanisms all argue for a much more complicated view of masking when making decisions about the risk of masking inherent in a given anthropogenic sound exposure scenario. PMID:26610979

  7. Influence of auditory fatigue on masked pure-tone thresholds

    NASA Technical Reports Server (NTRS)

    Parker, D. E.; Tubbs, R. L.; Johnston, P. A.; Johnston, L. S.

    1976-01-01

    A description is presented of four related experiments involving conditions of 3-kHz low-intensity masking, a replication of experiment I with slight variations, 3-kHz high-intensity masking, and 6-kHz low-intensity masking. The frequencies of the tones which the observers detected were 3 and 6 kHz. The observed change in masked-tone threshold as a function of fatigue is discussed. It is found that masked-tone-detection thresholds remain essentially unchanged following fatigue if the masking-noise intensity is sufficiently great.

  8. High quality mask storage in an advanced Logic-Fab

    NASA Astrophysics Data System (ADS)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  9. Continuous and Localized Mn Implantation of ZnO

    PubMed Central

    2009-01-01

    We present results derived from continuous and localized 35 keV55Mn+ion implantations into ZnO. Localized implantations were carried out by using self-ordered alumina membranes as masks leading to ordered arrays of implanted volumes on the substrate surfaces. Defects and vacancies in the small implantation volumes of ZnO were generated due to the implantation processes besides the creation of new phases. Rapid thermal annealing was applied in the case of continuous implantation. The samples were characterized by HRSEM, GIXRD, Raman spectroscopy and RBS/C. Magnetic characterization of the samples pointed out appreciable differences among the samples obtained by the different implantation methods. This fact was mainly attributed to the different volume/surface ratios present in the implanted zones as well as to the increase of Mn atom concentrations along the grain frontiers in the nanostructured surfaces. The samples also showed a ferromagnetic transition phase at temperature value higher than room temperature. PMID:20596285

  10. Elusive structure of helium trimers

    NASA Astrophysics Data System (ADS)

    Stipanović, Petar; Vranješ Markić, Leandra; Boronat, Jordi

    2016-09-01

    Over the years many He–He interaction potentials have been developed, some very sophisticated, including various corrections beyond the Born–Oppenheimer approximation. Most of them were used to predict properties of helium dimers and trimers, examples of exotic quantum states, whose experimental study proved to be very challenging. Recently, detailed structural properties of helium trimers were measured for the first time, allowing a comparison with theoretical predictions and possibly enabling the evaluation of different interaction potentials. The comparisons already made included adjusting the maxima of both theoretical and experimental correlation functions to one, so the overall agreement between theory and experiment appeared satisfactory. However, no attempt was made to evaluate the quality of the interaction potentials used in the calculations. In this work, we calculate the experimentally measured correlation functions using both new and old potentials, compare them with experimental data and rank the potentials. We use diffusion Monte Carlo simulations at T = 0, which give within statistical noise exact results of the ground state properties. All models predict both trimers 4He3 and 4He{}2{}3He to be in a quantum halo state.

  11. Elusive structure of helium trimers

    NASA Astrophysics Data System (ADS)

    Stipanović, Petar; Vranješ Markić, Leandra; Boronat, Jordi

    2016-09-01

    Over the years many He-He interaction potentials have been developed, some very sophisticated, including various corrections beyond the Born-Oppenheimer approximation. Most of them were used to predict properties of helium dimers and trimers, examples of exotic quantum states, whose experimental study proved to be very challenging. Recently, detailed structural properties of helium trimers were measured for the first time, allowing a comparison with theoretical predictions and possibly enabling the evaluation of different interaction potentials. The comparisons already made included adjusting the maxima of both theoretical and experimental correlation functions to one, so the overall agreement between theory and experiment appeared satisfactory. However, no attempt was made to evaluate the quality of the interaction potentials used in the calculations. In this work, we calculate the experimentally measured correlation functions using both new and old potentials, compare them with experimental data and rank the potentials. We use diffusion Monte Carlo simulations at T = 0, which give within statistical noise exact results of the ground state properties. All models predict both trimers 4He3 and 4He{}2{}3He to be in a quantum halo state.

  12. Helium-flow measurement using ultrasonic technique

    NASA Astrophysics Data System (ADS)

    Sondericker, J. H.

    1983-08-01

    The ideal cryogenic instrumentation for the colliding beam accelerator helium distribution system does not add pressure drop to the system, functions over the entire temperature range, has high resolution, and delivers accurate mass flow measurement data. The design and testing of an ultrasonic flowmeter which measures helium flow under different temperatures are described.

  13. Detection of Hydrogen and Helium with EPHIN

    NASA Astrophysics Data System (ADS)

    Gómez-Herrero, R.; Rodríguez-Frías, M. D.; del Peral, L.; Sequeiros, J.; Müller-Mellin, R.; Kunow, H.; Sierks, H.

    2001-08-01

    A Monte Carlo simulation code based on GEANT 3.21 has been used to follow the SOHO (Solar and Heliospheric Observatory)/EPHIN (Electron, Proton and Helium Instrument) response to the detection of hydrogen and helium nuclei. The geometrical factor dependence on the energy has been evaluated and the contamination of the EPHIN channels has been obtained.

  14. Stability of Helium Clusters during Displacement Cascades

    SciTech Connect

    Yang, Li; Zu, Xiaotao T.; Xiao, H. Y.; Gao, Fei; Heinisch, Howard L.; Kurtz, Richard J.; Wang, Zhiguo; Liu, K. Z.

    2007-02-01

    The interaction of displacement cascades with helium-vacancy clusters is investigated using molecular dynamics simulations. The He-vacancy clusters initially consist of 20 vacancies with a Helium-to-vacancy ratio ranging from 0.2 to 3. The primary knock-on atom (PKA) energy, Ep, varies from 2 keV to 10 keV, and the PKA direction is chosen such that a displacement cascade is able to directly interact with a helium-vacancy cluster. The simulation results show that the effect of displacement cascades on a helium-vacancy cluster strongly depends on both the helium-to-vacancy ratio and the PKA energy. For the same PKA energy, the size of helium-vacancy clusters increases with the He/V ratio, but for the same ratio, the cluster size changes more significantly with increasing PKA energy. It has been observed that the He-vacancy clusters can be dissolved when the He/V ratio less than 1, but they are able to re-nucleate during the thermal spike phase, forming small He-V nuclei. When the He/V ratio is larger than 1, the He-V clusters can absorb a number of vacancies produced by displacement cascades, forming larger He-V clusters. These results are discussed in terms of PKA energy, helium-to-vacancy ratio, number of vacancies produced by cascades, and mobility of helium atoms.

  15. LOX Tank Helium Removal for Propellant Scavenging

    NASA Technical Reports Server (NTRS)

    Chato, David J.

    2009-01-01

    System studies have shown a significant advantage to reusing the hydrogen and oxygen left in these tanks after landing on the Moon in fuel cells to generate power and water for surface systems. However in the current lander concepts, the helium used to pressurize the oxygen tank can substantially degrade fuel cell power and water output by covering the reacting surface with inert gas. This presentation documents an experimental investigation of methods to remove the helium pressurant while minimizing the amount of the oxygen lost. This investigation demonstrated that significant quantities of Helium (greater than 90% mole fraction) remain in the tank after draining. Although a single vent cycle reduced the helium quantity, large amounts of helium remained. Cyclic venting appeared to be more effective. Three vent cycles were sufficient to reduce the helium to small (less than 0.2%) quantities. Two vent cycles may be sufficient since once the tank has been brought up to pressure after the second vent cycle the helium concentration has been reduced to the less than 0.2% level. The re-pressurization process seemed to contribute to diluting helium. This is as expected since in order to raise the pressure liquid oxygen must be evaporated. Estimated liquid oxygen loss is on the order of 82 pounds (assuming the third vent cycle is not required).

  16. Helium Speech: An Application of Standing Waves

    ERIC Educational Resources Information Center

    Wentworth, Christopher D.

    2011-01-01

    Taking a breath of helium gas and then speaking or singing to the class is a favorite demonstration for an introductory physics course, as it usually elicits appreciative laughter, which serves to energize the class session. Students will usually report that the helium speech "raises the frequency" of the voice. A more accurate description of the…

  17. 30 CFR 256.11 - Helium.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... of and the right to extract helium from all gas produced from the leased area. (b) In case the United... helium extracted. The United States shall determine the amount of reasonable compensation. The United... substantial delays in the delivery of natural gas produced to the purchaser of that gas....

  18. 30 CFR 256.11 - Helium.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... the United States, under section 12(f) of the Act, of the ownership of and the right to extract helium... other loss for which he is not reasonably compensated, except for the value of the helium extracted. The... delivery of natural gas produced to the purchaser of that gas....

  19. Paramagnetic Attraction of Impurity-Helium Solids

    NASA Technical Reports Server (NTRS)

    Bernard, E. P.; Boltnev, R. E.; Khmelenko, V. V.; Lee, D. M.

    2003-01-01

    Impurity-helium solids are formed when a mixture of impurity and helium gases enters a volume of superfluid helium. Typical choices of impurity gas are hydrogen deuteride, deuterium, nitrogen, neon and argon, or a mixture of these. These solids consist of individual impurity atoms and molecules as well as clusters of impurity atoms and molecules covered with layers of solidified helium. The clusters have an imperfect crystalline structure and diameters ranging up to 90 angstroms, depending somewhat on the choice of impurity. Immediately following formation the clusters aggregate into loosely connected porous solids that are submerged in and completely permeated by the liquid helium. Im-He solids are extremely effective at stabilizing high concentrations of free radicals, which can be introduced by applying a high power RF dis- charge to the impurity gas mixture just before it strikes the super fluid helium. Average concentrations of 10(exp 19) nitrogen atoms/cc and 5 x 10(exp 18) deuterium atoms/cc can be achieved this way. It shows a typical sample formed from a mixture of atomic and molecular hydrogen and deuterium. It shows typical sample formed from atomic and molecular nitrogen. Much of the stability of Im-He solids is attributed to their very large surface area to volume ratio and their permeation by super fluid helium. Heat resulting from a chance meeting and recombination of free radicals is quickly dissipated by the super fluid helium instead of thermally promoting the diffusion of other nearby free radicals.

  20. Proton implantation for the isolation of AlGaAs/GaAs quantum cascade lasers

    NASA Astrophysics Data System (ADS)

    Szerling, A.; Kosiel, K.; Kozubal, M.; Myśliwiec, M.; Jakieła, R.; Kuc, M.; Czyszanowski, T.; Kruszka, R.; Pągowska, K.; Karbownik, P.; Barcz, A.; Kamińska, E.; Piotrowska, A.

    2016-07-01

    The novel fabrication scheme of the mid-infrared (∼9.5 μm) Al0.45Ga0.55As/GaAs plasmon-enhanced-waveguide quantum cascade laser (QCL) is reported. The electric isolation was made exclusively by 6.5 μm-deep proton implantation. The applied implantation allowed us to suppress the current spreading and at the same time enabled the laser radiation confinement without any mesa formation. A galvanic gold layer at least 3.5 μm thick covering the top ohmic contact was used as a mask for implantation. This mask was not removed after the implantation, but it served for heat spreading from the laser. A considerable reduction in the necessary technological steps was obtained with the presented novel fabrication scheme, in comparison with the standard mesa-etching-based method.

  1. A new approach for defect inspection on large area masks

    NASA Astrophysics Data System (ADS)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  2. Adaptation to different noninvasive ventilation masks in critically ill patients*

    PubMed Central

    da Silva, Renata Matos; Timenetsky, Karina Tavares; Neves, Renata Cristina Miranda; Shigemichi, Liane Hirano; Kanda, Sandra Sayuri; Maekawa, Carla; Silva, Eliezer; Eid, Raquel Afonso Caserta

    2013-01-01

    OBJECTIVE: To identify which noninvasive ventilation (NIV) masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%). Total face masks were the most commonly used (in 74.7%), followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively). Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed. PMID:24068269

  3. Helium, Carbon, and Helium Isotopes in the Northern Lau Basin

    NASA Astrophysics Data System (ADS)

    Lupton, J. E.; Butterfield, D. A.; Lilley, M. D.; Resing, J.; Embley, R. W.; Arculus, R. J.; Rubin, K. H.; Evans, L.; Greene, R.

    2009-12-01

    Helium isotope ratios in hydrothermal fluids and volcanic rocks in the northern Lau Basin show a complex pattern reflecting influences from diverse mantle sources, including the Samoan hotspot, the Tofua Arc, and mid-ocean ridge (MOR)-type upper mantle. The Samoan Islands represent a “high 3He” hotspot with 3He/4He ratios up to 38 Ra (where Ra is the 3He/4He ratio in air, 1.39 x 10-6) [Farley et al, 1992; Jackson et al., 2007]. In contrast to the 3He-rich helium in Samoa, typical back-arc spreading centers have MOR-type helium values of 7-9 Ra, while volcanic arcs have lower ratios of 5-7 Ra. In the northwestern part of the Lau Basin, basalt samples from the Northwest Lau Spreading Center and the Rochambeau Rifts have 3He/4He varying from 11 to 28 Ra, far above typical back-arc or MOR values. These elevated 3He/4He ratios indicate that the Samoan hotspot signal has somehow penetrated southward into the northern Lau Basin, presumably through a tear in the subducting Pacific Plate. In the northeastern Lau Basin, 3He/4He ratios in hydrothermal fluids from two sites on the Northeast Lau Spreading Center have 3He/4He of 8.0 and 8.7 Ra. These are MOR-type values typical for a back-arc spreading center. At the actively erupting West Mata volcano, vent fluids have 3He/4He of 7.3 Ra, while farther east at Volcano P analysis of water-column plume samples gave a value of 6.7 Ra for the estimated end-member 3He/4He value. This decrease in 3He/4He going toward the east indicates increasing arc influence with increasing proximity to the Tofua Arc. This interpretation is supported by the C/3He ratios in the hydrothermal fluids, which average 1-3 x 109 at vent sites on the NELSC (typical MOR values) and increase to a typical arc value of 2 x 1010 at West Mata. Analyses of volcanic rocks from the eruption sites on the NELSC and West Mata are in progress and should help to further define these variations.

  4. Clean induced feature CD shift of EUV mask

    NASA Astrophysics Data System (ADS)

    Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

    2016-05-01

    EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when

  5. Masked object registration in the Fourier domain.

    PubMed

    Padfield, Dirk

    2012-05-01

    Registration is one of the most common tasks of image analysis and computer vision applications. The requirements of most registration algorithms include large capture range and fast computation so that the algorithms are robust to different scenarios and can be computed in a reasonable amount of time. For these purposes, registration in the Fourier domain using normalized cross-correlation is well suited and has been extensively studied in the literature. Another common requirement is masking, which is necessary for applications where certain regions of the image that would adversely affect the registration result should be ignored. To address these requirements, we have derived a mathematical model that describes an exact form for embedding the masking step fully into the Fourier domain so that all steps of translation registration can be computed efficiently using Fast Fourier Transforms. We provide algorithms and implementation details that demonstrate the correctness of our derivations. We also demonstrate how this masked FFT registration approach can be applied to improve the Fourier-Mellin algorithm that calculates translation, rotation, and scale in the Fourier domain. We demonstrate the computational efficiency, advantages, and correctness of our algorithm on a number of images from real-world applications. Our framework enables fast, global, parameter-free registration of images with masked regions.

  6. A new mask exposure and analysis facility

    NASA Astrophysics Data System (ADS)

    te Sligte, Edwin; Koster, Norbert; Deutz, Alex; Staring, Wilbert

    2014-10-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

  7. Testing Tactile Masking between the Forearms.

    PubMed

    D'Amour, Sarah; Harris, Laurence R

    2016-01-01

    Masking, in which one stimulus affects the detection of another, is a classic technique that has been used in visual, auditory, and tactile research, usually using stimuli that are close together to reveal local interactions. Masking effects have also been demonstrated in which a tactile stimulus alters the perception of a touch at a distant location. Such effects can provide insight into how components of the body's representations in the brain may be linked. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at corresponding contralateral locations. To explore the matching of corresponding points across the body, we can measure the spatial tuning and effect of posture on contralateral masking. Careful controls are required to rule out direct effects of the remote stimulus, for example by mechanical transmission, and also attention effects in which thresholds may be altered by the participant's attention being drawn away from the stimulus of interest. The use of this technique is beneficial as a behavioural measure for exploring which parts of the body are functionally connected and whether the two sides of the body interact in a somatotopic representation. This manuscript describes a behavioural protocol that can be used for studying contralateral tactile masking. PMID:26889736

  8. The laryngeal mask airway in obstetrical anaesthesia.

    PubMed

    Gataure, P S; Hughes, J A

    1995-02-01

    The laryngeal mask airway (LMA) has been used extensively to provide a safe airway in spontaneously breathing patients who are not at risk from aspiration of gastric contents. The role of the LMA in the event of a failed intubation in an obstetrical patient, and its place in a failed intubation drill remains unclear. Two hundred and fifty consultant obstetric anaesthetists in the United Kingdom were asked to complete an anonymous questionnaire regarding their views about using the laryngeal mask airway (LMA) in obstetrical anaesthesia. The LMA was available in 91.4% of obstetric units. Seventy-two per cent of anaesthetists were in favour of using the LMA to maintain oxygenation when tracheal intubation had failed and ventilation using a face mask was inadequate. Twenty-four respondents had had personal experience with the LMA in obstetrical anaesthesia, eight of whom stated that the LMA had proved to be a lifesaver. We believe that the LMA has a role in obstetrical anaesthesia when tracheal intubation has failed and ventilation using a face mask proves to be impossible, and it should be inserted before attempting cricothyroidectomy. PMID:7720155

  9. Associative Learning of Discrimination with Masked Stimuli

    ERIC Educational Resources Information Center

    Marcos, Jose L.

    2007-01-01

    Great controversy exists on whether associative learning occurs without awareness. In Experiment 1, 31 participants received discrimination training by repeated presentations of two stimulus sequences (S1[subscript A] right arrow S2[subscript A], and S1[subscript B] right arrow S2[subscript B]), S1 being a masked stimulus. S2 were imperative…

  10. Pattern inspection of etched multilayer EUV mask

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro

    2015-07-01

    Patterned mask inspection for an etched multilayer (ML) EUV mask was investigated. In order to optimize the mask structure from the standpoint of not only a pattern inspection by using a projection electron microscope (PEM), but also by considering the other fabrication processes using electron beam (EB) techniques such as CD metrology and mask repair, we employed a conductive layer between the ML and substrate. By measuring the secondary electron emission coefficients (SEECs) of the candidate materials for conductive layer, we evaluated the image contrast and the influence of charging effect. In the cases of 40-pair-ML, 16 nm sized extrusion and intrusion defects were found to be detectable more than 10 sigma in hp 44 nm, 40 nm, and 32 nm line and space (L/S) patterns. Reducing 40-pair-ML to 20-pair-ML degraded the image contrast and the defect detectability. However, by selecting B4C as a conductive layer, 16 nm sized defects remained detectable. A double layer structure with 2.5-nm-thik B4C on metal film used as a conductive layer was found to have sufficient conductivity and also was found to be free from the surface charging effect and influence of native oxide.

  11. Pattern inspection of etched multilayer EUV mask

    NASA Astrophysics Data System (ADS)

    Iida, Susumu; Hirano, Ryoichi; Amano, Tsuyoshi; Watanabe, Hidehiro

    2015-10-01

    Patterned mask inspection for an etched multilayer (ML) EUV mask was investigated. In order to optimize the mask structure from the standpoint of not only a pattern inspection by using a projection electron microscope (PEM), but also by considering the other fabrication processes using electron beam (EB) techniques such as CD metrology and mask repair, we employed a conductive layer between the ML and substrate. By measuring the secondary electron emission coefficients (SEECs) of the candidate materials for conductive layer, we evaluated the image contrast and the influence of charging effect. In the cases of 40-pair-ML, 16 nm sized extrusion and intrusion defects were found to be detectable more than 10 sigma in hp 44 nm, 40 nm, and 32 nm line and space (L/S) patterns. Reducing 40-pair-ML to 20-pair-ML degraded the image contrast and the defect detectability. However, by selecting B4C as a conductive layer, 16 nm sized defects remained detectable. These defects were also detected after the etched part was refilled with Si. Moreover, the simulation shows a high sensitivity for detecting the residual-type defects (etching residues). A double layer structure with 2.5-nm-thik B4C on metal film used as a conductive layer was found to have sufficient conductivity and also was found to be free from the surface charging effect and influence of native oxide.

  12. Gemini helium closed cycle cooling system

    NASA Astrophysics Data System (ADS)

    Lazo, Manuel; Galvez, Ramon; Rogers, Rolando; Solis, Hernan; Tapia, Eduardo; Maltes, Diego; Collins, Paul; White, John; Cavedoni, Chas; Yamasaki, Chris; Sheehan, Michael P.; Walls, Brian

    2008-07-01

    The Gemini Observatory presents the Helium Closed Cycle Cooling System that provides cooling capacity at cryogenic temperatures for instruments and detectors. It is implemented by running three independent helium closed cycle cooling circuits with several banks of compressors in parallel to continuously supply high purity helium gas to cryocoolers located about 100-120 meters apart. This poster describes how the system has been implemented, the required helium pressures and gas flow to reach cryogenic temperature, the performance it has achieved, the helium compressors and cryocoolers in use and the level of vibration the cryocoolers produce in the telescope environment. The poster also describes the new technology for cryocoolers that Gemini is considering in the development of new instruments.

  13. Infrared Signature Masking by Air Plasma Radiation

    NASA Technical Reports Server (NTRS)

    Kruger, C. H.; Laux, C. O.

    1998-01-01

    This report describes progress during the second year of our research program on Infrared Signature Masking by Air Plasmas at Stanford University. This program is intended to investigate the masking of infrared signatures by the air plasma formed behind the bow shock of high velocity missiles. Our previous annual report described spectral measurements and modeling of the radiation emitted between 3.2 and 5.5 microns by an atmospheric pressure air plasma in chemical and thermal equilibrium at a temperature of approximately 3100 K. One of our goals was to examine the spectral emission of secondary species such as water vapor or carbon dioxide. The cold air stream injected in the plasma torch contained approximately 330 parts per million Of CO2, which is the natural CO2 concentration in atmospheric air at room temperature, and a small amount of water vapor with an estimated mole fraction of 3.8 x 10(exp -4). As can be seen from Figure 1, it was found that the measured spectrum exhibited intense spectral features due to the fundamental rovibrational bands of NO at 4.9 - 5.5 microns and the V(3) band of CO2 (antisymmetric stretch) at 4.2-4.8 microns. These observations confirmed the well-known fact that infrared signatures between 4.15 - 5.5 microns can be masked by radiative emission in the interceptor's bow-shock. Figure I also suggested that the range 3.2 - 4.15 microns did not contain any significant emission features (lines or continuum) that could mask IR signatures. However, the signal-to-noise level, close to one in that range, precluded definite conclusions. Thus, in an effort to further investigate the spectral emission in the range of interest to signature masking problem, new measurements were made with a higher signal-to-noise ratio and an extended wavelength range.

  14. Sensitivity to masked conditioned stimuli predicts conditioned response magnitude under masked conditions

    PubMed Central

    Cornwell, Brian R.; Echiverri, Aileen M.; Grillon, Christian

    2009-01-01

    Expression of conditioned fear has been reported to be independent of perceptual awareness of conditioned stimuli (CSs). Previous studies have been criticized, however, for not adequately assessing perceptual awareness. We fear-conditioned participants to one of two symbols and measured skin conductance responses to dichoptically masked and unmasked CSs. Participants also performed a target detection task and sensitivity (d′) to the masked conditioned stimuli (CS+, CS−) was measured. Results showed that sensitivity under masking conditions was related to conditioned responses to masked CSs but not unmasked CSs. Thus, a strong relationship between expression of conditioned fear and awareness of the CS+ emerges when the latter is assessed by signal detection methods. Without consensus on how awareness should be defined, these findings bring balance to previous studies that have typically used less sensitive assessments of awareness. PMID:17433097

  15. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    SciTech Connect

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  16. Disentangling neural processing of masked and masking stimulus by means of event-related contralateral - ipsilateral differences of EEG potentials.

    PubMed

    Verleger, Rolf; Jaśkowski, Piotr

    2007-01-01

    In spite of the excellent temporal resolution of event-related EEG potentials (ERPs), the overlapping potentials evoked by masked and masking stimuli are hard to disentangle. However, when both masked and masking stimuli consist of pairs of relevant and irrelevant stimuli, one left and one right from fixation, with the side of the relevant element varying between pairs, effects of masked and masking stimuli can be distinguished by means of the contralateral preponderance of the potentials evoked by the relevant elements, because the relevant elements may independently change sides in masked and masking stimuli. Based on a reanalysis of data from which only selected contralateral-ipsilateral effects had been previously published, the present contribution will provide a more complete picture of the ERP effects in a masked-priming task. Indeed, effects evoked by masked primes and masking targets heavily overlapped in conventional ERPs and could be disentangled to a certain degree by contralateral-ipsilateral differences. Their major component, the N2pc, is interpreted as indicating preferential processing of stimuli matching the target template, which process can neither be identified with conscious perception nor with shifts of spatial attention. The measurements showed that the triggering of response preparation by the masked stimuli did not depend on their discriminability, and their priming effects on the processing of the following target stimuli were qualitatively different for stimulus identification and for response preparation. These results provide another piece of evidence for the independence of motor-related and perception-related effects of masked stimuli.

  17. Ocular barotrauma caused by mask squeeze during a scuba dive.

    PubMed

    Rudge, F W

    1994-07-01

    I describe the case of a 25-year-old man who, after a scuba dive, had ocular barotrauma caused by mask squeeze. As in most cases, the condition occurred because the patient failed to exhale into the mask during descent to equalize the pressure within the mask. Although alarming in appearance, the condition is generally mild and self-limited. Patients should be instructed in the proper technique of mask clearing before they return to diving to prevent a recurrence.

  18. Automated mask creation from a 3D model using Faethm.

    SciTech Connect

    Schiek, Richard Louis; Schmidt, Rodney Cannon

    2007-11-01

    We have developed and implemented a method which given a three-dimensional object can infer from topology the two-dimensional masks needed to produce that object with surface micro-machining. The masks produced by this design tool can be generic, process independent masks, or if given process constraints, specific for a target process. This design tool calculates the two-dimensional mask set required to produce a given three-dimensional model by investigating the vertical topology of the model.

  19. On the Nature of Phonological Assembly: Evidence from Backward Masking.

    ERIC Educational Resources Information Center

    Perry, Conrad; Ziegler, Johannes C.

    2002-01-01

    Used backward masking paradigm to investigate nature and time course of phonological assembly. Two experiments examined to what extent phonological assembly is a serial process. One showed recognition rates in a backward masking task varied as a function of the serial position of phonemes that were shared between backward masks and target words;…

  20. Performance and stability of mask process correction for EBM-7000

    NASA Astrophysics Data System (ADS)

    Saito, Yasuko; Chen, George; Wang, Jen-Shiang; Bai, Shufeng; Howell, Rafael; Li, Jiangwei; Tao, Jun; VanDenBroeke, Doug; Wiley, Jim; Takigawa, Tadahiro; Ohnishi, Takayuki; Kamikubo, Takashi; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi

    2010-05-01

    In order to support complex optical masks today and EUV masks in the near future, it is critical to correct mask patterning errors with a magnitude of up to 20nm over a range of 2000nm at mask scale caused by short range mask process proximity effects. A new mask process correction technology, MPC+, has been developed to achieve the target requirements for the next generation node. In this paper, the accuracy and throughput performance of MPC+ technology is evaluated using the most advanced mask writing tool, the EBM-70001), and high quality mask metrology . The accuracy of MPC+ is achieved by using a new comprehensive mask model. The results of through-pitch and through-linewidth linearity curves and error statistics for multiple pattern layouts (including both 1D and 2D patterns) are demonstrated and show post-correction accuracy of 2.34nm 3σ for through-pitch/through-linewidth linearity. Implementing faster mask model simulation and more efficient correction recipes; full mask area (100cm2) processing run time is less than 7 hours for 32nm half-pitch technology node. From these results, it can be concluded that MPC+ with its higher precision and speed is a practical technology for the 32nm node and future technology generations, including EUV, when used with advance mask writing processes like the EBM-7000.

  1. Attributes of tinnitus and the acceptance of masking.

    PubMed

    Vernon, J; Griest, S; Press, L

    1990-01-01

    Various characteristics of tinnitus were surveyed to determine whether they were associated with the acceptance of masking, which is used as a relief procedure for tinnitus. The characteristics considered were duration, loudness match, minimum masking level, and residual inhibition. Data for the characteristics of tinnitus were obtained from the Tinnitus Data Registry at the Oregon Hearing Research Center, which contains information on 784 tinnitus patients. The acceptance of masking was determined by each individual patient based on actual tests with wearable masking units. Variations in the individual characteristics listed above were not found to be significantly associated with the acceptance of masking and thus should not be used a priori to deny patients the opportunity for possible relief of their tinnitus. A masking indicator was found to be significantly (P = .03) associated with the acceptance of masking. This masking indicator is obtained by subtracting the loudness match of the tinnitus from the minimum masking level. When the masking indicator was 10 dB or less, the acceptance of masking was in excess of 50%. The data presented may help to dispel some current misconceptions about the masking of tinnitus. PMID:2181884

  2. How color, regularity, and good Gestalt determine backward masking.

    PubMed

    Sayim, Bilge; Manassi, Mauro; Herzog, Michael

    2014-06-18

    The strength of visual backward masking depends on the stimulus onset asynchrony (SOA) between target and mask. Recently, it was shown that the conjoint spatial layout of target and mask is as crucial as SOA. Particularly, masking strength depends on whether target and mask group with each other. The same is true in crowding where the global spatial layout of the flankers and target-flanker grouping determine crowding strength. Here, we presented a vernier target followed by different flanker configurations at varying SOAs. Similar to crowding, masking of a red vernier target was strongly reduced for arrays of 10 green compared with 10 red flanking lines. Unlike crowding, single green lines flanking the red vernier showed strong masking. Irregularly arranged flanking lines yielded stronger masking than did regularly arranged lines, again similar to crowding. While cuboid flankers reduced crowding compared with single lines, this was not the case in masking. We propose that, first, masking is reduced when the flankers are part of a larger spatial structure. Second, spatial factors counteract color differences between the target and the flankers. Third, complex Gestalts, such as cuboids, seem to need longer processing times to show ungrouping effects as observed in crowding. Strong parallels between masking and crowding suggest similar underlying mechanism; however, temporal factors in masking additionally modulate performance, acting as an additional grouping cue.

  3. How Does Target Duration Affect Object Substitution Masking?

    ERIC Educational Resources Information Center

    Gellatly, Angus; Pilling, Michael; Carter, Wakefield; Guest, Duncan

    2010-01-01

    Object substitution masking (OSM) is typically studied using a brief search display. The target item may be indicated by a cue/mask surrounding but not overlapping it. Report of the target is reduced when mask offset trails target offset rather than being simultaneous with it. We report 5 experiments investigating whether OSM can be obtained if…

  4. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  5. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  6. 21 CFR 868.5550 - Anesthetic gas mask.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Anesthetic gas mask. 868.5550 Section 868.5550...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5550 Anesthetic gas mask. (a) Identification. An anesthetic gas mask is a device, usually made of conductive rubber, that is positioned over...

  7. Does "Darkness" Lead to "Happiness"? Masked Suffix Priming Effects

    ERIC Educational Resources Information Center

    Dunabeitia, Jon Andoni; Perea, Manuel; Carreiras, Manuel

    2008-01-01

    Masked affix priming effects have usually been obtained for words sharing the initial affix (e.g., "reaction"-"REFORM"). However, prior evidence on masked suffix priming effects (e.g., "baker"-"WALKER") is inconclusive. In the present series of masked priming lexical decision experiments, a target word was briefly preceded by a morphologically or…

  8. Homophone Dominance Modulates the Phonemic-Masking Effect.

    ERIC Educational Resources Information Center

    Berent, Iris; Van Orden, Guy C.

    2000-01-01

    Finds (1) positive phonemic-masking effects occurred for dominant homophones; (2) null phonemic-masking effects occurred for subordinate homophones; and (3) subordinate homophones were much more likely to be falsely identified as their dominant mate. Suggests the source of these null phonemic-masking is itself a phonology effect. Concludes…

  9. Dynamics of vortex assisted metal condensation in superfluid helium

    NASA Astrophysics Data System (ADS)

    Popov, Evgeny; Mammetkuliyev, Muhammet; Eloranta, Jussi

    2013-05-01

    both superfluid bulk liquid helium and helium droplets, both of which share the common element of a rapid passage through the lambda point. The origin of vorticity is tentatively assigned to the Zurek-Kibble mechanism. Implications of the large gas bubble formation by laser ablation to previous experiments aimed at implanting atomic and dimeric species in bulk superfluid helium are also discussed, and it is proposed that the developed visualization method should be used as a diagnostic tool in such experiments to avoid measurements in dense gaseous environments.

  10. Helium Saturation of Liquid Propellants

    NASA Technical Reports Server (NTRS)

    Yavrouian, A. H.; Moran, Clifford M.

    1990-01-01

    The research is in three areas which are: (1) techniques were devised for achieving the required levels of helium (He) saturation in liquid propellants (limited to monomethylhydrazine (MMH) and nitrogen tetroxide (NTO)); (2) the values were evaluated for equilibrium solubilities of He in liquid propellants as currently used in the industry; and (3) the He dissolved in liquid propellants were accurately measured. Conclusions drawn from these studies include: (1) Techniques for dissolving He in liquid propellants depending upon the capabilities of the testing facility (Verification of the quantity of gas dissolved is essential); (2) Until greater accuracy is obtained, the equilibrium solubility values of He in MMH and NTO as cited in the Air Force Propellant Handbooks should be accepted as standard (There are still enough uncertainties in the He saturation values to warrant further basic experimental studies); and (3) The manometric measurement of gas volume from a frozen sample of propellant should be the accepted method for gas analysis.

  11. Atom lithography with metastable helium

    SciTech Connect

    Allred, Claire S.; Reeves, Jason; Corder, Christopher; Metcalf, Harold

    2010-02-15

    A bright metastable helium (He*) beam is collimated sequentially with the bichromatic force and three optical molasses velocity compression stages. Each He* atom in the beam has 20 eV of internal energy that can destroy a molecular resist assembled on a gold coated silicon wafer. Patterns in the resist are imprinted onto the gold layer with a standard selective etch. Patterning of the wafer with the He{sup *} was demonstrated with two methods. First, a mesh was used to protect parts of the wafer making an array of grid lines. Second, a standing wave of {lambda}=1083 nm light was used to channel and focus the He* atoms into lines separated by {lambda}/2. The patterns were measured with an atomic force microscope establishing an edge resolution of 80 nm. Our results are reliable and repeatable.

  12. Swelling or erosion on the surface of patterned GaN damaged by heavy ion implantation

    SciTech Connect

    Gao, Yuan; Lan, Chune; Xue, Jianming; Yan, Sha; Wang, Yugang; Xu, Fujun; Shen, Bo; Zhang, Yanwen

    2010-06-08

    Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au+ ions at room temperature under different doses, respectively. Ion implantation was performed through photoresist masks on GaN to produce alternating strips. The experimental results showed that the step height of swelling and decomposition in implanted GaN depended on ion dose and annealing temperature, i.e., damage level and its evolution. This damage evolution is contributed to implantation-induced defect production, and defect migration/accumulation occurred at different levels of displacement per atom. The results suggest that the swelling is due to the formation of porous structures in the amorphous region of implanted GaN. The decomposition of implanted area can be attributed to the disorder saturation and the diffusion of surface amorphous layer.

  13. 42 CFR 84.118 - Half-mask facepieces, full facepieces, and mouthpieces; fit; minimum requirements.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.118 Half-mask facepieces, full facepieces, and... reduce the respiratory protective qualities of the gas mask. (c) Half-mask facepieces shall not...

  14. 42 CFR 84.118 - Half-mask facepieces, full facepieces, and mouthpieces; fit; minimum requirements.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... OF RESPIRATORY PROTECTIVE DEVICES Gas Masks § 84.118 Half-mask facepieces, full facepieces, and... reduce the respiratory protective qualities of the gas mask. (c) Half-mask facepieces shall not...

  15. Theoretical Study of Helium Insertion and Diffusion in 3C-SiC

    SciTech Connect

    Van Ginhoven, Renee M.; Chartier, Alan; Meis, Constantin; Weber, William J.; Corrales, Louis R.

    2006-01-01

    Insertion and diffusion of helium in cubic silicon carbide have been investigated by means of density functional theory. That method has first been assessed by calculating relevant properties for the perfect crystal along with point defect formation energies. Results are consistent with available theoretical as well as experimental data. Helium insertion energies have been calculated to be lower for divacancy and silicon vacancy defects compared to the other mono-vacancies and interstitial sites considered. Migration barriers for helium have been determined by using the nudged elastic band method. Calculated activation energies for migration in and around vacancies (silicon vacancy, carbon vacancy or divacancy) range from 0.6 to 1.0 eV. The activation energy for interstitial migration is calculated to be 2.5 eV. These values are discussed and related to recent experimental activation energies for migration that range from 1.1 to 3.2 eV, depending on the SiC samples used and on helium implantation conditions.

  16. Mask CD measurement approach by diffraction intensity for lithography equivalent

    NASA Astrophysics Data System (ADS)

    Nagai, Takaharu; Mesuda, Kei; Sutou, Takanori; Inazuki, Yuichi; Hashimoto, Hiroyuki; Yokoyama, Toshifumi; Toyama, Nobuhito; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya

    2008-04-01

    In 45nm node and beyond with hyper NA lithography, mask topography effect is not ignorable and mask CD bias impacts printing performance such as MEEF or exposure latitude. In that situation, 3D simulation is required for precise evaluation of printing performance and the accuracy of 3D mask model on simulation is a key issue. Verification of 3D mask model by diffraction intensity measurement with AIMS TM45-193i was discussed in our previous works. Through the verification, though real mask successfully creates effective or simulated diffractions, CD on 3D mask model on simulation was different to that on AIMS TM result which was measured by CD-SEM. Therefore, purpose of this work is to analyze the cause of CD differences through AIMS TM diffraction intensity evaluation in various conditions (mask material, pattern pitch, mask CD bias and mask CD-SEM system). Furthermore, lithography equivalent CD is proposed as width of "ideal" mask shape. As a result achieved from the experiments, constant CD shift was successfully observed at hp40-70nm L/S pattern with varied bias for both 6% EAPSM and Binary masks. It can be said that mask topography difference related to mask material and pattern dimensions has not been observed. On the other hand, the value of CD shift was smaller on the condition of newer generation CD-SEM measurement. Other result achieved from further discussion and analysis, cause of the CD difference was explained using simple SEM image simulation. The CD difference was mainly changed by electron beam size factor, and it was stable with side wall angle in the range of 80 to 90 degree if the middle CD, which is the width of 3D model defined at the half height of the mask film's thickness, is constant. Since side wall angles on actual masks are nearly 90 degree, lithography equivalent CD could be measured by CD-SEM with constant offset.

  17. Helium-3 and diffuse Helium-4 emissions prior the 2014-15 Fogo eruption, Cape Verde

    NASA Astrophysics Data System (ADS)

    Asensio-Ramos, María; Padrón, Eleazar; Dionis, Samara; Sumino, Hirochika; Fernandes, Paulo; Melián, Gladys V.; Barrancos, José; Hernández, Pedro A.; Rodríguez, Fátima; Silva, Sónia; Pérez, Nemesio M.; Padilla, Germán; Bandomo, Zuleyka; Cabral, Jeremias; Calvo, David; Pereira, José Manuel; Semedo, Helio

    2015-04-01

    On November 23, 2014 a new volcanic eruption started at the southwestern flank of Pico do Fogo volcano (Fogo Island, Cape Verde) after 19 years of the last eruptive event. Helium-3 emission from fumarole discharges and diffuse helium-4 degassing studies have been carried out regularly at the summit crater of Pico do Fogo since May 2007 until March 2014. The first published data on helium isotopes and diffuse helium-4 degassing from Pico do Fogo volcano is related to the field work performed on February 2010 which shows already relatively high helium-3 emission, 8.53 ± 0.9 R/RA (being R and RA the sample and atmospheric 3He/4He isotope ratio, respectively), and diffuse helium-4 degassing rate, 4.2 ± 0.2 kg d-1 (Dionis et al., 2015). During the eight year period 2007-2014, helium-4 emission rate was measured yearly at 50 different sampling sites selected in the surface environment of the summit crater of Pico do Fogo (0.14 km2) following the Darcy's law, and assuming that helium-4 emission is mainly governed by convection. The distribution of the sampling sites was carefully chosen to homogeneously cover the target area, allowing the computation of the total helium-4 emission by sequential Gaussian simulation (sGs). In addition, helium-3 emission was measured in the fumarole gases following the method described by Sumino et al. (2001). During the eight year period, convective helium-4 emission ranged between 1.2 and 5.7 kg d-1, and helium-3 emission between 7.73 and 8.82 R/RA. Both helium-4 and helium-3 emission showed significant increases on February 2010, suggesting a potential magma intrusion into the volcanic system of Pico do Fogo. However, the highest observed values of both parameters were observed on November, 2013 (helium-3 emission) and on March 2014 (diffuse helium-4 emission) suggesting a second magma intrusion giving rise to the volcanic eruption on November 23, 2014. As was observed in other volcanic systems (Padrón et al., 2013), helium degassing

  18. Hydrothermal Helium Plumes over Submarine Volcanoes of the Marianas Arc

    NASA Astrophysics Data System (ADS)

    Lupton, J. E.; Baker, E. T.; Embley, R. W.; Resing, J. E.; Massoth, G. J.; Nakamura, K.; Greene, R.; Walker, S.; Lebon, G.

    2003-12-01

    During February-March, 2003, as part of the Submarine Ring of Fire project funded by NOAA's Ocean Exploration Program, the R/V T.G. Thompson conducted a comprehensive survey of hydrothermal activity along 1200 km of the Mariana Arc from 13.5° N to 22.5° N [see Embley et al., EOS Trans. AGU, 2003]. Plume surveys were conducted in the water-column above ~50 submarine volcanoes using a CTD/rosette system. A total of 70 CTD casts were completed, and discrete water samples were collected for analysis of a variety of hydrothermal tracers, including 3He, CH4, CO2, H2S, Fe, Mn, pH, and suspended particles. Although shorebased analysis of the samples is still underway, preliminary results indicate that about 11 of the 50 submarine volcanoes surveyed are hydrothermally active. Because many of the Marianas Arc volcanoes rise to within 500 m of the sea surface, hydrothermal plume signals such as light attenuation (suspended particles) and temperature anomaly have limited utility due to masking by near surface effects. For this reason 3He, an unambiguous hydrothermal tracer, has been particularly useful for identifying which of the shallow arc volcanoes are hydrothermally active. Our expectation was that the water-column helium signal might be reduced at shallow depths due to ventilation into the atmosphere. However, we observed very high 3He enrichments at shallow depths both at Maug Islands and at NW Rota #1 (14° 36'N; 144° 46.5'E). The 3He enrichments were strongly correlated with changes in pH, Mn, and other hydrothermal tracers. The three Maug Islands mark the perimeter of a caldera formed by an explosive eruption, and a single hydrocast in the center of the caldera detected a robust helium plume at 120-200 m depth with δ 3He reaching a maximum of 250% at 150m depth. Analysis of the co-variation of [3He] vs. [4He] at Maug gave R/Ra = 6.6 for an estimate of the end-member helium isotope ratio (R = 3He/4He and Ra = Rair). This value falls well within the range of R

  19. Helium refrigeration considerations for cryomodule design

    SciTech Connect

    Ganni, V.; Knudsen, P.

    2014-01-29

    Many of the present day accelerators are based on superconducting radio frequency (SRF) cavities, packaged in cryo-modules (CM), which depend on helium refrigeration at sub-atmospheric pressures, nominally 2 K. These specialized helium refrigeration systems are quite cost intensive to produce and operate. Particularly as there is typically no work extraction below the 4.5-K supply, it is important that the exergy loss between this temperature level and the CM load temperature(s) be minimized by the process configuration choices. This paper will present, compare and discuss several possible helium distribution process arrangements to support the CM loads.

  20. Site specific isolated nanostructure array formation on a large area by broad ion beam without any mask and resist

    SciTech Connect

    Karmakar, Prasanta

    2014-06-09

    We report the formation of isolated nanostructure arrays on a large area via broad ion beam implantation without the aid of any mask or resist. Desired ions have been implanted at specific locations of the prefabricated silicon ripple or triangular structures by exploiting the variation of local ion impact angles. We have shown that the implantation of Fe ions on an O{sup +} ions induced pre fabricated triangular shaped patterned Si surface results in a self-organized periodic array of striped magnetic nanostructures having several micron length and about 50 nm width arranged with a spacial separation of ∼200 nm. The morphology, composition, crystalline structure, and magnetic property of these nanopatterns have been analyzed using high-resolution cross-sectional transmission electron microscopy and atomic force microscopy. A geometrical model has been proposed to explain the fundamental features of such ion-induced nanopattern structures.

  1. Tunable lithography masks using chiral nematic fluids

    NASA Astrophysics Data System (ADS)

    Jeong, Hyeon Su; Srinivasarao, Mohan; Jung, Hee-Tae

    2013-03-01

    We present a facile route for pattern formation using chiral nematic fluids as tunable masks in lithography process. The chiral nematic phase prepared by adding a chiral dopant (CB15) to 5CB acted as a set of parallel cylindrical lenses and as a polarization selective photomask for the preparation of periodic line patterns. The pitch of the helical twist was easily controlled by the concentration of chiral agent and the feature size of the resulting pattern was easily tuned. Because of the high mobility of the small liquid crystalline compound, the preparation of chiral nematic fluids based lithography masks requires only a few seconds. This approach has significant advantages including facility, range of surface ordering, and rate of forming periodic arrays. Current affiliation: SK Innovation, Daejeon, Korea

  2. Informational masking of speech in dyslexic children.

    PubMed

    Calcus, Axelle; Colin, Cécile; Deltenre, Paul; Kolinsky, Régine

    2015-06-01

    Studies evaluating speech perception in noise have reported inconsistent results regarding a potential deficit in dyslexic children. So far, most of them investigated energetic masking. The present study evaluated situations inducing mostly informational masking, which reflects cognitive interference induced by the masker. Dyslexic children were asked to identify a female target syllable presented in quiet, babble, unmodulated, and modulated speech-shaped noise. Whereas their performance was comparable to normal-reading children in quiet, it dropped significantly in all noisy conditions compared to age-, but not reading level-matched controls. Interestingly, noise affected similarly the reception of voicing, place, and manner of articulation in dyslexic and normal-reading children. PMID:26093461

  3. Masking mediated print defect visibility predictor

    NASA Astrophysics Data System (ADS)

    Jing, Xiaochen; Nachlieli, Hila; Shaked, Doron; Shiffman, Smadar; Allebach, Jan P.

    2012-01-01

    Banding is a well-known artifact produced by printing systems. It usually appears as lines perpendicular to the process direction of the print. Therefore, banding is an important print quality issue which has been analyzed and assessed by many researchers. However, little literature has focused on the study of the masking effect of content for this kind of print quality issue. Compared with other image and print quality research, our work is focused on the print quality of typical documents printed on a digital commercial printing press. In this paper, we propose a Masking Mediated Print Defect Visibility Predictor (MMPDVP) to predict the visibility of defects in the presence of customer content. The parameters of the algorithm are trained from ground-truth images that have been marked by subjects. The MMPDVP could help the press operator decide whether the print quality is acceptable for specific customer requirements. Ultimately, this model can be used to optimize the print-shop workflow.

  4. Phase measurements of EUV mask defects

    DOE PAGES

    Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine; Benk, Markus P.; Goldberg, Kenneth A.; Neureuther, Andrew R.; Naulleau, Patrick P.; Waller, Laura

    2015-02-22

    Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than themore » conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.« less

  5. Phase measurements of EUV mask defects

    SciTech Connect

    Claus, Rene A.; Wang, Yow-Gwo; Wojdyla, Antoine; Benk, Markus P.; Goldberg, Kenneth A.; Neureuther, Andrew R.; Naulleau, Patrick P.; Waller, Laura

    2015-02-22

    Extreme Ultraviolet (EUV) Lithography mask defects were examined on the actinic mask imaging system, SHARP, at Lawrence Berkeley National Laboratory. Also, a quantitative phase retrieval algorithm based on the Weak Object Transfer Function was applied to the measured through-focus aerial images to examine the amplitude and phase of the defects. The accuracy of the algorithm was demonstrated by comparing the results of measurements using a phase contrast zone plate and a standard zone plate. Using partially coherent illumination to measure frequencies that would otherwise fall outside the numerical aperture (NA), it was shown that some defects are smaller than the conventional resolution of the microscope. We found that the programmed defects of various sizes were measured and shown to have both an amplitude and a phase component that the algorithm is able to recover.

  6. Masking in three-dimensional auditory displays.

    PubMed

    Doll, T J; Hanna, T E; Russotti, J S

    1992-06-01

    The extent to which simultaneous inputs in a three-dimensional (3D) auditory display mask one another was studied in a simulated sonar task. The minimum signal-to-noise ratio (SNR) required to detect an amplitude-modulated 500-Hz tone in a background of broadband noise was measured using a loudspeaker array in a free field. Three aspects of the 3D array were varied: angular separation of the sources, degree of correlation of the background noises, and listener head movement. Masking was substantially reduced when the sources were uncorrelated. The SNR needed for detection decreased with source separation, and the rate of decrease was significantly greater with uncorrelated sources than with partially or fully correlated sources. Head movement had no effect on the SNR required for detection. Implications for the design and application of 3D auditory displays are discussed.

  7. Contrast Gain Control Model Fits Masking Data

    NASA Technical Reports Server (NTRS)

    Watson, Andrew B.; Solomon, Joshua A.; Null, Cynthia H. (Technical Monitor)

    1994-01-01

    We studied the fit of a contrast gain control model to data of Foley (JOSA 1994), consisting of thresholds for a Gabor patch masked by gratings of various orientations, or by compounds of two orientations. Our general model includes models of Foley and Teo & Heeger (IEEE 1994). Our specific model used a bank of Gabor filters with octave bandwidths at 8 orientations. Excitatory and inhibitory nonlinearities were power functions with exponents of 2.4 and 2. Inhibitory pooling was broad in orientation, but narrow in spatial frequency and space. Minkowski pooling used an exponent of 4. All of the data for observer KMF were well fit by the model. We have developed a contrast gain control model that fits masking data. Unlike Foley's, our model accepts images as inputs. Unlike Teo & Heeger's, our model did not require multiple channels for different dynamic ranges.

  8. Partitioning mechanisms of masking: contrast transducer versus divisive inhibition

    NASA Astrophysics Data System (ADS)

    Barghout-Stein, Lauren; Tyler, Christopher W.; Klein, Stanley A.

    1997-06-01

    The properties of spatial vision mechanisms are often explored psychophysically with simultaneous masking paradigms. A variety of hypotheses have been proposed to explain how the mask pattern utilized in these paradigms increases threshold. Numerous studies have investigated the properties of a particular origin of masking hypothesis but few have attempted to compare the properties of masking at several points in the process. Our study isolates masking due to lateral divisive inhibition at a point where mechanism responses are combined, and compares it with masking of the same target due to a nonlinearity either intrinsic to a mechanism or directly operating on the response of a single mechanism. We also measure the slopes of psychometric functions to examine the relationship between uncertainty and mask contrast. Studies of simultaneous masking utilizing a pedestal mask (an identical test and mask pattern) have measured facilitation for low contrast masks. This decrease in threshold from the solo target threshold is commonly referred to as the 'dipper' effect and has been explained as an increase in signal-to- noise ratio from the high unmasked level occurring as the visual system becomes more certain of target location. The level of uncertainty is indicated by the slope of sensitivity to the target as a function of target contrast in the threshold region. In these studies, high contrast masks have evoked an increase in target threshold. There have been many theories explaining this threshold increase. Some suggest that masking is the result of an intrinsic nonlinearity within a mechanism or of a contrast nonlinearity that operates directly on the output of a single mechanism. Others put the source of masking at a gain control operation which occurs when a surrounding set of mechanisms divide the response of a single mechanism by their summed response. Still others attribute the masking to noise that is multiplicative relative to the neural response signal, or

  9. Masked hypertension: A common but insidious presentation of hypertension

    PubMed Central

    McKay, Donald W; Myers, Martin G; Bolli, Peter; Chockalingam, Arun

    2006-01-01

    A patient has masked hypertension when his office blood pressure is less than 140/90 mmHg but his ambulatory or home blood pressure readings are in the hypertensive range. Several recent studies have demonstrated that cardiovascular risk is similar between those with masked hypertension and those with sustained hypertension. The prevalence of masked hypertension in Canada is not known, but data from other countries suggest rates greater than 8%. Physicians need to use careful clinical judgment to identify and treat subjects with masked hypertension. The present review discusses masked hypertension, its importance to clinical practice and some aspects of patient management. PMID:16755318

  10. Numerically designed phase-mask for stellar coronagraph

    NASA Astrophysics Data System (ADS)

    Baba, Naoshi; Murakami, Naoshi; Miura, Noriaki; Tamura, Motohide

    2015-09-01

    Phase-mask coronagraph holds the ability to detect exoplanets very close to their parent star. We report a new kind of phase mask that performs the contrast ratio of more than the tenth power of 10 for a circular aperture with shades of a secondary mirror and spiders. The phase distribution of the phase mask is numerically obtained by making the leaked light distribute outside the transparent part of the pupil. We applied the hybrid input-output algorithm, one of phase retrieval methods, to find the phase distribution of the phase mask. We show the characteristics of thus obtained phase mask.

  11. 21 CFR 868.1640 - Helium gas analyzer.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Helium gas analyzer. 868.1640 Section 868.1640...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Diagnostic Devices § 868.1640 Helium gas analyzer. (a) Identification. A helium gas analyzer is a device intended to measure the concentration of helium in a...

  12. 21 CFR 868.1640 - Helium gas analyzer.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... 21 Food and Drugs 8 2011-04-01 2011-04-01 false Helium gas analyzer. 868.1640 Section 868.1640...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Diagnostic Devices § 868.1640 Helium gas analyzer. (a) Identification. A helium gas analyzer is a device intended to measure the concentration of helium in a...

  13. 21 CFR 868.1640 - Helium gas analyzer.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 8 2014-04-01 2014-04-01 false Helium gas analyzer. 868.1640 Section 868.1640...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Diagnostic Devices § 868.1640 Helium gas analyzer. (a) Identification. A helium gas analyzer is a device intended to measure the concentration of helium in a...

  14. 21 CFR 868.1640 - Helium gas analyzer.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 8 2013-04-01 2013-04-01 false Helium gas analyzer. 868.1640 Section 868.1640...) MEDICAL DEVICES ANESTHESIOLOGY DEVICES Diagnostic Devices § 868.1640 Helium gas analyzer. (a) Identification. A helium gas analyzer is a device intended to measure the concentration of helium in a...

  15. Implant success!!!.....simplified.

    PubMed

    Luthra, Kaushal K

    2009-01-01

    The endeavor towards life-like restoration has helped nurture new vistas in the art and science of implant dentistry. The protocol of "restoration-driven implant placement" ensures that the implant is an apical extension of the ideal future restoration and not the opposite. Meticulous pre-implant evaluation of soft and hard tissues, diagnostic cast and use of aesthetic wax-up and radiographic template combined with surgical template can simplify the intricate roadmap for appropriate implant treatment.By applying the harmony of artistic skill, scientific knowledge and clinical expertise, we can simply master the outstanding implant success in requisites of aesthetics, phonetics and function.

  16. The EOS CERES Global Cloud Mask

    NASA Technical Reports Server (NTRS)

    Berendes, T. A.; Welch, R. M.; Trepte, Q.; Schaaf, C.; Baum, B. A.

    1996-01-01

    To detect long-term climate trends, it is essential to produce long-term and consistent data sets from a variety of different satellite platforms. With current global cloud climatology data sets, such as the International Satellite Cloud Climatology Experiment (ISCCP) or CLAVR (Clouds from Advanced Very High Resolution Radiometer), one of the first processing steps is to determine whether an imager pixel is obstructed between the satellite and the surface, i.e., determine a cloud 'mask.' A cloud mask is essential to studies monitoring changes over ocean, land, or snow-covered surfaces. As part of the Earth Observing System (EOS) program, a series of platforms will be flown beginning in 1997 with the Tropical Rainfall Measurement Mission (TRMM) and subsequently the EOS-AM and EOS-PM platforms in following years. The cloud imager on TRMM is the Visible/Infrared Sensor (VIRS), while the Moderate Resolution Imaging Spectroradiometer (MODIS) is the imager on the EOS platforms. To be useful for long term studies, a cloud masking algorithm should produce consistent results between existing (AVHRR) data, and future VIRS and MODIS data. The present work outlines both existing and proposed approaches to detecting cloud using multispectral narrowband radiance data. Clouds generally are characterized by higher albedos and lower temperatures than the underlying surface. However, there are numerous conditions when this characterization is inappropriate, most notably over snow and ice of the cloud types, cirrus, stratocumulus and cumulus are the most difficult to detect. Other problems arise when analyzing data from sun-glint areas over oceans or lakes over deserts or over regions containing numerous fires and smoke. The cloud mask effort builds upon operational experience of several groups that will now be discussed.

  17. Extreme Ultraviolet Lithography - Reflective Mask Technology

    SciTech Connect

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  18. Mask Analysis Program (MAP) reference manual

    NASA Technical Reports Server (NTRS)

    Mitchell, C. L.

    1976-01-01

    A document intended to serve as a User's Manual and a Programmer's Manual for the Mask Analysis Program is presented. The first portion of the document is devoted to the user. It contains all of the information required to execute MAP. The remainder of the document describes the details of MAP software logic. Although the information in this portion is not required to run the program, it is recommended that every user review it to gain an appreciation for the program functions.

  19. Mask-to-wafer alignment system

    DOEpatents

    Sweatt, William C.; Tichenor, Daniel A.; Haney, Steven J.

    2003-11-04

    A modified beam splitter that has a hole pattern that is symmetric in one axis and anti-symmetric in the other can be employed in a mask-to-wafer alignment device. The device is particularly suited for rough alignment using visible light. The modified beam splitter transmits and reflects light from a source of electromagnetic radiation and it includes a substrate that has a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation. The substrate defines a hole pattern about a central line of the substrate. In operation, an input beam from a camera is directed toward the modified beam splitter and the light from the camera that passes through the holes illuminates the reticle on the wafer. The light beam from the camera also projects an image of a corresponding reticle pattern that is formed on the mask surface of the that is positioned downstream from the camera. Alignment can be accomplished by detecting the radiation that is reflected from the second surface of the modified beam splitter since the reflected radiation contains both the image of the pattern from the mask and a corresponding pattern on the wafer.

  20. Binaural effects in simultaneous room reflection masking

    NASA Astrophysics Data System (ADS)

    Buchholz, Joerg M.

    2005-04-01

    Masked thresholds (MT) for a single test reflection masked by a direct sound (200 ms long broadband noise) were measured dependent on the time delay of the reflection for diotic as well as dichotic stimulus presentation. In the diotic case, the direct sound and the test reflection were presented equally to both ears via headphones. In the dichotic case, an ITD of 0.5 ms was added to the test reflection. In order to focus on simultaneous masking effects, the reflection was truncated in such a way that it formed a common offset with the direct sound. For the diotic case, the resulting data showed a MT increase with increasing reflection delay and for the dichotic case a MT decrease with increasing reflection delay, producing an intercept between both curves at a reflection delay of 6-8 ms. Hence, negative BMLDs (up to -8 dB) were found for very early reflections and positive BMLDs (up to +8 dB) for later reflections, suggesting a binaural mechanism that suppresses very early reflections and enhances later reflections. The measurement results are discussed in the background of different auditory models.

  1. Dose masking feature for BNCT radiotherapy planning

    DOEpatents

    Cook, Jeremy L.; Wessol, Daniel E.; Wheeler, Floyd J.

    2000-01-01

    A system for displaying an accurate model of isodoses to be used in radiotherapy so that appropriate planning can be performed prior to actual treatment on a patient. The nature of the simulation of the radiotherapy planning for BNCT and Fast Neutron Therapy, etc., requires that the doses be computed in the entire volume. The "entire volume" includes the patient and beam geometries as well as the air spaces in between. Isodoses derived from the computed doses will therefore extend into the air regions between the patient and beam geometries and thus depict the unrealistic possibility that radiation deposition occurs in regions containing no physical media. This problem is solved by computing the doses for the entire geometry and then masking the physical and air regions along with the isodose contours superimposed over the patient image at the corresponding plane. The user is thus able to mask out (remove) the contour lines from the unwanted areas of the image by selecting the appropriate contour masking region from the raster image.

  2. Direct-write three-dimensional nanofabrication of nanopyramids and nanocones on Si by nanotumefaction using a helium ion microscope

    NASA Astrophysics Data System (ADS)

    Zhang, L.; Heinig, N. F.; Bazargan, S.; Abd-Ellah, M.; Moghimi, N.; Leung, K. T.

    2015-06-01

    The recently commercialized helium ion microscope (HIM) has already demonstrated its outstanding imaging capabilities in terms of resolution, surface sensitivity, depth of field and ease of charge compensation. Here, we show its exceptional patterning capabilities by fabricating dense lines and three-dimensional (3D) nanostructures on a Si substrate. Small focusing spot size and confined ion-Si interaction volume of a high-energy helium ion beam account for the high resolution in HIM patterning. We demonstrate that a set of resolvable parallel lines with a half pitch as small as 3.5 nm can be achieved. During helium ion bombardment of the Si surface, implantation outperforms milling due to the small mass of the helium ions, which produces tumefaction instead of depression in the Si surface. The Si surface tumefaction is the result of different kinetic processes including diffusion, coalescence and nanobubble formation of the implanted ions, and is found to be very stable structurally at room temperature. Under appropriate conditions, a linear dependence of the surface swollen height on the ion doses can be observed. This relation has enabled us to fabricate nanopyramids and nanocones, thus demonstrating that HIM patterning provides a new ‘bottom-up’ approach to fabricate 3D nanostructures. This surface tumefaction method is direct, both positioning and height accurate, and free of resist, etch, mode and precursor, and it promises new applications in nanoimprint mold fabrication and photomask clear defect reparation.

  3. Microstructure of HIPed and SPSed 9Cr-ODS steel and its effect on helium bubble formation

    NASA Astrophysics Data System (ADS)

    Lu, Chenyang; Lu, Zheng; Xie, Rui; Liu, Chunming; Wang, Lumin

    2016-06-01

    Two 9Cr-ODS steels with the same nominal composition were consolidated by hot isostatic pressing (HIP, named COS-1) and spark plasma sintering (SPS, named COS-2). Helium ions were implanted into COS-1, COS-2 and non-ODS Eurofer 97 steels up at 673 K. Microstructures before and after helium ion implantations were carefully characterized. The results show a bimodal grain size distribution in COS-2 and a more uniform grain size distribution in COS-1. Nanoscale clusters of GP-zone type Y-Ti-O and Y2Ti2O7 pyrochlore as well as large spinel Mn(Ti)Cr2O4 particles are all observed in the two ODS steels. The Y-Ti-enriched nano-oxides in COS-1 exhibit higher number density and smaller size than in COS-2. The Y-Ti-enriched nano-oxides in fine grains of COS-2 show higher number density and smaller size than that in coarse grains of COS-2. Nano-oxides effectively trap helium atoms and lead to the formation of high density and ultra-fine helium bubbles.

  4. [Biomaterials in cochlear implants].

    PubMed

    Stöver, T; Lenarz, T

    2009-05-01

    Cochlear implants (CI) represent the "gold standard" for the treatment of congenitally deaf children and postlingually deafened adults. Thus, cochlear implantation is a success story of new bionic prosthesis development. Owing to routine application of cochlear implants in adults but also in very young children (below the age of one), high demands are placed on the implants. This is especially true for biocompatibility aspects of surface materials of implant parts which are in contact with the human body. In addition, there are various mechanical requirements which certain components of the implants must fulfil, such as flexibility of the electrode array and mechanical resistance of the implant housing. Due to the close contact of the implant to the middle ear mucosa and because the electrode array is positioned in the perilymphatic space via cochleostomy, there is a potential risk of bacterial transferral along the electrode array into the cochlea. Various requirements that have to be fulfilled by cochlear implants, such as biocompatibility, electrode micromechanics, and although a very high level of technical standards has been carried out there is still demand for the improvement of implants as well as of the materials used for manufacturing, ultimately leading to increased implant performance. General considerations of material aspects related to cochlear implants as well as potential future perspectives of implant development will be discussed.

  5. Calculated Regenerator Performance at 4 K with HELIUM-4 and HELIUM-3

    NASA Astrophysics Data System (ADS)

    Radebaugh, Ray; Huang, Yonghua; O'Gallagher, Agnes; Gary, John

    2008-03-01

    The helium-4 working fluid in regenerative cryocoolers operating with the cold end near 4 K deviates considerably from an ideal gas. As a result, losses in the regenerator, given by the time-averaged enthalpy flux, are increased and are strong functions of the operating pressure and temperature. Helium-3, with its lower boiling point, behaves somewhat closer to an ideal gas in this low temperature range and can reduce the losses in 4 K regenerators. An analytical model is used to find the fluid properties that strongly influence the regenerator losses as well as the gross refrigeration power. The thermodynamic and transport properties of helium-3 were incorporated into the latest NIST regenerator numerical model, known as REGEN3.3, which was used to model regenerator performance with either helium-4 or helium-3. With this model we show how the use of helium-3 in place of helium-4 can improve the performance of 4 K regenerative cryocoolers. The effects of operating pressure, warm-end temperature, and frequency on regenerators with helium-4 and helium-3 are investigated and compared. The results are used to find optimum operating conditions. The frequency range investigated varies from 1 Hz to 30 Hz, with particular emphasis on higher frequencies.

  6. Challenges and requirements of mask data processing for multi-beam mask writer

    NASA Astrophysics Data System (ADS)

    Choi, Jin; Lee, Dong Hyun; Park, Sinjeung; Lee, SookHyun; Tamamushi, Shuichi; Shin, In Kyun; Jeon, Chan Uk

    2015-07-01

    To overcome the resolution and throughput of current mask writer for advanced lithography technologies, the platform of e-beam writer have been evolved by the developments of hardware and software in writer. Especially, aggressive optical proximity correction (OPC) for unprecedented extension of optical lithography and the needs of low sensitivity resist for high resolution result in the limit of variable shaped beam writer which is widely used for mass production. The multi-beam mask writer is attractive candidate for photomask writing of sub-10nm device because of its high speed and the large degree of freedom which enable high dose and dose modulation for each pixel. However, the higher dose and almost unlimited appetite for dose modulation challenge the mask data processing (MDP) in aspects of extreme data volume and correction method. Here, we discuss the requirements of mask data processing for multi-beam mask writer and presents new challenges of the data format, data flow, and correction method for user and supplier MDP tool.

  7. Helium Dilution Cryocooler for Space Applications

    NASA Technical Reports Server (NTRS)

    Roach, Pat; Hogan, Robert (Technical Monitor)

    2001-01-01

    NASA's New Millenium Program Space Technology presents the Helium Dilution Cryocooler for Space Applications. The topics include: 1) Capability; 2) Applications; and 3) Advantages. This paper is in viewgraph form.

  8. Helium and Enhanced Image of the Sun

    NASA Video Gallery

    This video blinks between an image in Helium and an enhanced image. The original image is from AIA on SDO and the enhanced image was created at the LM Solar and Astrophysics Laboratory (LMSAL) by D...

  9. Helium Find Thaws the Cold Fusion Trail.

    ERIC Educational Resources Information Center

    Pennisi, E.

    1991-01-01

    Reported is a study of cold fusion in which trace amounts of helium, possible evidence of an actual fusion reaction, were found. Research methodology is detailed. The controversy over the validity of experimental results with cold fusion are reviewed. (CW)

  10. Commissioning of a new helium pipeline

    NASA Technical Reports Server (NTRS)

    2000-01-01

    Center Director Roy Bridges addresses the audience at the commissioning of a new high-pressure helium pipeline at Kennedy Space Center that will service launch needs at the new Delta IV Complex 37 at Cape Canaveral Air Force Station. The nine-mile- long buried pipeline will also serve as a backup helium resource for Shuttle launches. Nearly one launch's worth of helium will be available in the pipeline to support a Shuttle pad in an emergency. The line originates at the Helium Facility on KSC and terminates in a meter station at the perimeter of the Delta IV launch pad. Others at the ceremony were Jerry Jorgensen, pipeline project manager, Space Gateway Support (SGS); Col. Samuel Dick, representative of the 45th Space Wing; Ramon Lugo, acting executive director, JPMO; David Herst, director, Delta IV Launch Sites; Pierre Dufour, president and CEO, Air Liquide America Corporation; and Michael Butchko, president, SGS.

  11. Commissioning of a new helium pipeline

    NASA Technical Reports Server (NTRS)

    2000-01-01

    Jerry Jorgensen welcomes the audience to the commissioning of a new high-pressure helium pipeline at Kennedy Space Center. Jorgensen, with Space Gateway Support (SGS), is the pipeline project manager. To the right is Ramon Lugo, acting executive director, JPMO. Others at the ceremony were Center Director Roy Bridges; Col. Samuel Dick, representative of the 45th Space Wing; David Herst, director, Delta IV Launch Sites; Pierre Dufour, president and CEO, Air Liquide America Corporation; and Michael Butchko, president, SGS. The pipeline will service launch needs at the new Delta IV Complex 37 at Cape Canaveral Air Force Station. The nine-mile-long buried pipeline will also serve as a backup helium resource for Shuttle launches. Nearly one launch's worth of helium will be available in the pipeline to support a Shuttle pad in an emergency. The line originates at the Helium Facility on KSC and terminates in a meter station at the perimeter of the Delta IV launch pad.

  12. Commissioning of a new helium pipeline

    NASA Technical Reports Server (NTRS)

    2000-01-01

    At the commissioning of a new high-pressure helium pipeline at Kennedy Space Center, Ramon Lugo, acting executive director, JPMO , presents a plaque to Center Director Roy Bridges. The pipeline will service launch needs at the new Delta IV Complex 37 at Cape Canaveral Air Force Station. Others at the ceremony were Jerry Jorgensen, pipeline project manager, Space Gateway Support (SGS); Col. Samuel Dick, representative of the 45th Space Wing; David Herst, director, Delta IV Launch Sites; Pierre Dufour, president and CEO, Air Liquide America Corporation; and Michael Butchko, president, SGS. The nine-mile-long buried pipeline will also serve as a backup helium resource for Shuttle launches. Nearly one launch's worth of helium will be available in the pipeline to support a Shuttle pad in an emergency. The line originates at the Helium Facility on KSC and terminates in a meter station at the perimeter of the Delta IV launch pad.

  13. Development of charcoal sorbents for helium cryopumping

    SciTech Connect

    Sedgley, D.W.; Tobin, A.G.

    1984-01-01

    Testing of the cryogenically cooled charcoal using fusion-compatible binders for pumping helium has shown promising results. The program demonstrated comparable or improved performance with these binders compared to the charcoal (type and size) using an epoxy binder.

  14. Cosmogenic helium in a terrestrial igneous rock

    NASA Technical Reports Server (NTRS)

    Kurz, M. D.

    1986-01-01

    New helium isotopic measurements on samples from the Kula formation of Haleakala volcano of Hawaii are presented that are best explained by an in situ cosmogenic origin for a significant fraction of the He-3. Results from crushing and stepwise heating experiments, and consideration of the exposure age of the sample at the surface and the cosmic ray fluxes strongly support this hypothesis. Although crustal cosmogenic helium has been proposed previously, this represents its first unambiguous identification in a terrestrial sample.

  15. Trace organic impurities in gaseous helium

    NASA Technical Reports Server (NTRS)

    Schehl, T. A.

    1973-01-01

    A program to determine trace organic impurities present in helium has been initiated. The impurities were concentrated in a cryogenic trap to permit detection and identification by a gas chromatographic-mass spectrometric technique. Gaseous helium (GHe) exhibited 63 GC flame ionization response peaks. Relative GC peak heights and identifications of 25 major impurities by their mass spectra are given. As an aid to further investigation, identities are proposed for 16 other components, and their mass spectra are given.

  16. Breast reconstruction - implants

    MedlinePlus

    ... visits, your surgeon injects a small amount of saline (salt water) through the valve into the expander. ... breast implants. Implants may be filled with either saline or a silicone gel. You may have another ...

  17. The effect of spatial competition between object-level representations of target and mask on object substitution masking.

    PubMed

    Guest, Duncan; Gellatly, Angus; Pilling, Michael

    2011-11-01

    One of the processes determining object substitution masking (OSM) is thought to be the spatial competition between independent object file representations of the target and mask (e.g., Kahan & Lichtman, 2006). In a series of experiments, we further examined how OSM is influenced by this spatial competition by manipulating the overlap between the surfaces created by the modal completion of the target (an outline square with a gap in one of its sides) and the mask (a four-dot mask). The results of these experiments demonstrate that increasing the spatial overlap between the surfaces of the target and mask increases OSM. Importantly, this effect is not caused by the mask interfering with the processing of the target features it overlaps. Overall, the data indicate, consistent with Kahan and Lichtman, that OSM can arise through competition between independent target and mask representations.

  18. Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

    PubMed

    Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevée, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D

    2015-06-29

    Diffractive mask-aligner lithography allows printing structures that have a sub-micrometer resolution by using non-contact mode. For such a purpose, masks are often designed to operate with monochromatic linearly polarized light, which is obtained by placing a spectral filter and a polarizer in the beam path. We propose here a mask design that includes a wire-grid polarizer (WGP) on the top side of a photo-mask and a diffractive element on the bottom one to print a 350 nm period grating by using a classical mask-aligner in proximity exposure mode. Linearly polarizing locally an unpolarized incident beam is only possible by using a WGP on the top side of the mask. This configuration opens the possibility to use different linear polarization orientation on a single mask and allows to print high resolution structures with different orientation within one exposure.

  19. High efficiency pump for space helium transfer

    NASA Technical Reports Server (NTRS)

    Hasenbein, Robert; Izenson, Michael G.; Swift, Walter L.; Sixsmith, Herbert

    1991-01-01

    A centrifugal pump was developed for the efficient and reliable transfer of liquid helium in space. The pump can be used to refill cryostats on orbiting satellites which use liquid helium for refrigeration at extremely low temperatures. The pump meets the head and flow requirements of on-orbit helium transfer: a flow rate of 800 L/hr at a head of 128 J/kg. The overall pump efficiency at the design point is 0.45. The design head and flow requirements are met with zero net positive suction head, which is the condition in an orbiting helium supply Dewar. The mass transfer efficiency calculated for a space transfer operation is 0.99. Steel ball bearings are used with gas fiber-reinforced teflon retainers to provide solid lubrication. These bearings have demonstrated the longest life in liquid helium endurance tests under simulated pumping conditions. Technology developed in the project also has application for liquid helium circulation in terrestrial facilities and for transfer of cryogenic rocket propellants in space.

  20. Equation of state of metallic helium

    SciTech Connect

    Shvets, V. T.

    2013-01-15

    The effective ion-ion interaction, free energy, pressure, and electric resistance of metallic liquid helium have been calculated in wide density and temperature ranges using perturbation theory in the electron-ion interaction potential. In the case of conduction electrons, the exchange interaction has been taken into account in the random-phase approximation and correlations have been taken into account in the local-field approximation. The solid-sphere model has been used for the nuclear subsystem. The diameter of these spheres is the only parameter of this theory. The diameter and density of the system at which the transition of helium from the singly ionized to doubly ionized state occurs have been estimated by analyzing the pair effective interaction between helium atoms. The case of doubly ionized helium atoms has been considered. Terms up to the third order of perturbation theory have been taken into account in the numerical calculations. The contribution of the third-order term is significant in all cases. The electric resistance and its temperature dependence for metallic helium are characteristic of simple divalent metals in the liquid state. The thermodynamic parameters-temperature and pressure densities-are within the ranges characteristic of the central regions of giant planets. This makes it possible to assume the existence of helium in the metallic state within the solar system.

  1. Sonic helium detectors in the Fermilab Tevatron

    SciTech Connect

    Bossert, R.J.; /Fermilab

    2006-01-01

    In the Fermilab Tevatron cryogenic system there are many remotely located low-pressure plate relief valves that must vent large volumes of cold helium gas when magnet quenches occur. These valves can occasionally stick open or not reseat completely, resulting in a large helium loss. As such, the need exists for a detector to monitor the relief valve's discharge area for the presence of helium. Due to the quantity needed, cost is an important factor. A unit has been developed and built for this purpose that is quite inexpensive. Its operating principle is based on the speed of sound, where two closely matched tubes operate at their acoustic resonant frequency. When helium is introduced into one of these tubes, the resulting difference in acoustic time of flight is used to trigger an alarm. At present, there are 39 of these units installed and operating in the Tevatron. They have detected many minor and major helium leaks, and have also been found useful in detecting a rise in the helium background in the enclosed refrigerator buildings. This paper covers the construction, usage and operational experience gained with these units over the last several years.

  2. Advanced helium magnetometer for space applications

    NASA Technical Reports Server (NTRS)

    Slocum, Robert E.

    1987-01-01

    The goal of this effort was demonstration of the concepts for an advanced helium magnetometer which meets the demands of future NASA earth orbiting, interplanetary, solar, and interstellar missions. The technical effort focused on optical pumping of helium with tunable solid state lasers. We were able to demonstrate the concept of a laser pumped helium magnetometer with improved accuracy, low power, and sensitivity of the order of 1 pT. A number of technical approaches were investigated for building a solid state laser tunable to the helium absorption line at 1083 nm. The laser selected was an Nd-doped LNA crystal pumped by a diode laser. Two laboratory versions of the lanthanum neodymium hexa-aluminate (LNA) laser were fabricated and used to conduct optical pumping experiments in helium and demonstrate laser pumped magnetometer concepts for both the low field vector mode and the scalar mode of operation. A digital resonance spectrometer was designed and built in order to evaluate the helium resonance signals and observe scalar magnetometer operation. The results indicate that the laser pumped sensor in the VHM mode is 45 times more sensitive than a lamp pumped sensor for identical system noise levels. A study was made of typical laser pumped resonance signals in the conventional magnetic resonance mode. The laser pumped sensor was operated as a scalar magnetometer, and it is concluded that magnetometers with 1 pT sensitivity can be achieved with the use of laser pumping and stable laser pump sources.

  3. Ion beam sputter modification of the surface morphology of biological implants

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.; Banks, B. A.

    1976-01-01

    The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion beam sputtered surfaces.

  4. Ion-beam-sputter modification of the surface morphology of biological implants

    NASA Technical Reports Server (NTRS)

    Weigand, A. J.; Banks, B. A.

    1977-01-01

    The surface chemistry and texture of materials used for biological implants may significantly influence their performance and biocompatibility. Recent interest in the microscopic control of implant surface texture has led to the evaluation of ion-beam sputtering as a potentially useful surface roughening technique. Ion sources, similar to electron-bombardment ion thrusters designed for propulsive applications, are used to roughen the surfaces of various biocompatible alloys or polymer materials. These materials are typically used for dental implants, orthopedic prostheses, vascular prostheses, and artificial heart components. Masking techniques and resulting surface textures are described along with progress concerning evaluation of the biological response to the ion-beam-sputtered surfaces.

  5. Rule-based OPC and MPC interaction for implant layers

    NASA Astrophysics Data System (ADS)

    Fu, Nan; Ning, Guoxiang; Werle, Florian; Roling, Stefan; Hecker, Sandra; Ackmann, Paul; Buergel, Christian

    2015-10-01

    Implant layers must cover both logic and SRAM devices with good fidelity even if feature density and pitch differ very much. The coverage design rules of implant layers for SRAM and logic to active layer can vary. Lithography targeting could be problematic, since it may cause issues of either over exposure in logic area or under exposure in SRAM area. The rule-based (RB) re-targeting in the SRAM issue features is to compensate the under exposure in SRAM area. However, the global sizing in SRAM may introduce some bridge issues. Selective targeting and communicating with active layer is necessary. Another method is to achieve different mean-to-nominal (MTN) in some special areas during the reticle process. Such implant wafer issues can also be resolved during the lithography and mask optimized data preparing flow or named as lithography tolerance mask process correction (MPC). In this manuscript, this conventional issue will be demonstrated which is either over exposure in logic area or under exposure in bitcell area. The selective rule-based re-targeting concerning active layer will also be discussed, together with the improved wafer CDSEM data. The alternative method is to achieve different mean-to-nominal in different reticle areas which can be realized by lithography tolerance MPC during reticle process. The investigation of alternative methods will be presented, as well as the trade-off between them to improve the wafer uniformity and process margin of implant layers.

  6. [Pathology of implants].

    PubMed

    Mittermayer, C; Eblenkamp, M; Richter, H A; Zwadlo-Klarwasser, G; Bhardwaj, R S; Klosterhalfen, B

    2002-01-01

    Progress in the surgery of implants and biomaterials can be accomplished by: 1. Painstakingly analysing and registering of defaulting implants after explantation within a "National Registry of Implant Pathology". 2. Development of a DNA-microarray named "Implantat/Chronic Wound" in order to discover the differential transcriptional activities of cells brought into contact with different foreign surfaces. 3. Predictive cell-engineering combined with custom-made implant surfaces with the aim of optimal patient care.

  7. The masked priming toolbox: an open-source MATLAB toolbox for masked priming researchers.

    PubMed

    Wilson, Andrew D; Tresilian, James; Schlaghecken, Friederike

    2011-03-01

    The Masked Priming Toolbox is an open-source collection of MATLAB functions that utilizes the free third-party PsychToolbox-3 (PTB3: Brainard, Spatial Vision, 10, 433-436, 1997; Kleiner, Brainard & Pelli, Perception, 36, 2007; Pelli, Spatial Vision, 10, 437-442, 1997). It is designed to allow a researcher to run masked (and unmasked) priming experiments using a variety of response devices (including keyboards, graphics tablets and force transducers). Very little knowledge of MATLAB is required; experiments are generated by creating a text file with the required parameters, and raw and analyzed data are output to Excel (as well as MATLAB) files for further analysis. The toolbox implements a variety of stimuli for use as primes and targets, as well as a variety of masks. Timing, size, location, and orientation of stimuli are all parameterizable. The code is open-source and made available on the Web under a Creative Commons License.

  8. Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

    NASA Astrophysics Data System (ADS)

    Wojdyla, Antoine; Donoghue, Alexander; Benk, Markus P.; Naulleau, Patrick P.; Goldberg, Kenneth A.

    2016-03-01

    EUV lithography uses reflective photomasks to print features on a wafer through the formation of an aerial image. The aerial image is influenced by the mask's substrate and pattern roughness and by photon shot noise, which collectively affect the line-width on wafer prints, with an impact on local critical dimension uniformity (LCDU). We have used SHARP, an actinic mask-imaging microscope, to study line-width roughness (LWR) in aerial images at sub-nanometer resolution. We studied the impact of photon density and the illumination partial coherence on recorded images, and found that at low coherence settings, the line-width roughness is dominated by photon noise, while at high coherence setting, the effect of speckle becomes more prominent, dominating photon noise for exposure levels of 4 photons/nm2 at threshold on the mask size.

  9. Helium and Neon in Comets

    NASA Technical Reports Server (NTRS)

    Jewitt, David

    1996-01-01

    Two comets were observed with EUVE in late 1994. Both comet Mueller and comet Borrelly are short-period comets having well established orbital elements and accurate ephemerides. Spectra of 40 ksec were taken of each. No evidence for emission lines from either Helium or Neon was detected. We calculated limits on the production rates of these atoms (relative to solar) assuming a standard isotropic outflow model, with a gas streaming speed of 1 km/s. The 3-sigma (99.7% confidence) limits (1/100,000 for He, 0.8 for Ne) are based on a conservative estimate of the noise in the EUVE spectra. They are also weakly dependent on the precise pointing and tracking of the EUVE field of view relative to the comet during the integrations. These limits are consistent with ice formation temperatures T greater than or equal to 30 K, as judged from the gas trapping experiments of Bar-Nun. For comparison, the solar abundances of these elements are He/O = 110, Ne/O = 1/16. Neither limit was as constraining as we had initially hoped, mainly because comets Mueller and Borrelly were intrinsically less active than anticipated.

  10. Pulsating Helium Atmosphere White Dwarfs

    NASA Astrophysics Data System (ADS)

    Provencal, Judith; Montgomery, Michael H.; Bischoff-Kim, Agnes; Shipman, Harry; Nitta, Atsuko; Whole Earth Telescope Collaboration

    2015-08-01

    The overwhelming majority of all stars currently on the main sequence as well as those from earlier generations will or have ended their stellar lives as white dwarf stars. White dwarfs are rich forensic laboratories linking the history and future evolution of our Galaxy. Their structure and atmospheric composition provide evidence of how the progenitors lived, how they evolved, and how they died. This information reveals details of processes governing the behavior of contemporary main sequence stars. Combined with their distribution in luminosity/temperature, white dwarfs strongly constrain models of galactic and cosmological evolution.GD358 is among the brightest (mv =13.7) and best studied of the pulsating white dwarfs. This helium atmoshere pulsator (DBV) has an extensive photometric database spanning 30 years, including nine multisite Whole Earth Telescope campaigns. GD358 exhibits a range of behaviors, from drastic changes in excited pulsation modes to variable multiplet splittings. We use GD358 as a template for an examination of the DBV class, combining photometric results with recent COS spectroscopy. The results present new questions concerning DB formation and evolution.

  11. Implantable Heart Aid

    NASA Technical Reports Server (NTRS)

    1984-01-01

    CPI's human-implantable automatic implantable defibrillator (AID) is a heart assist system, derived from NASA's space circuitry technology, that can prevent erratic heart action known as arrhythmias. Implanted AID, consisting of microcomputer power source and two electrodes for sensing heart activity, recognizes onset of ventricular fibrillation (VF) and delivers corrective electrical countershock to restore rhythmic heartbeat.

  12. Respiratory Source Control Using Surgical Masks With Nanofiber Media

    PubMed Central

    Skaria, Shaji D.; Smaldone, Gerald C.

    2014-01-01

    Background: Potentially infected individuals (‘source’) are sometimes encouraged to use face masks to reduce exposure of their infectious aerosols to others (‘receiver’). To improve compliance with Respiratory Source Control via face mask and therefore reduce receiver exposure, a mask should be comfortable and effective. We tested a novel face mask designed to improve breathability and filtration using nanofiber filtration. Methods: Using radiolabeled test aerosols and a calibrated exposure chamber simulating source to receiver interaction, facepiece function was measured with a life-like ventilated manikin model. Measurements included mask airflow resistance (pressure difference during breathing), filtration, (mask capture of exhaled radiolabeled test aerosols), and exposure (the transfer of ‘infectious’ aerosols from the ‘source’ to a ‘receiver’). Polydisperse aerosols were measured at the source with a mass median aerodynamic diameter of 0.95 µm. Approximately 90% of the particles were <2.0 µm. Tested facepieces included nanofiber prototype surgical masks, conventional surgical masks, and for comparison, an N95-class filtering facepiece respirator (commonly known as an ‘N95 respirator’). Airflow through and around conventional surgical face mask and nanofiber prototype face mask was visualized using Schlieren optical imaging. Results: Airflow resistance [ΔP, cmH2O] across sealed surgical masks (means: 0.1865 and 0.1791 cmH2O) approached that of the N95 (mean: 0.2664 cmH2O). The airflow resistance across the nanofiber face mask whether sealed or not sealed (0.0504 and 0.0311 cmH2O) was significantly reduced in comparison. In addition, ‘infected’ source airflow filtration and receiver exposure levels for nanofiber face masks placed on the source were comparable to that achieved with N95 placed on the source; 98.98% versus 82.68% and 0.0194 versus 0.0557, respectively. Compared to deflection within and around the conventional face

  13. Source mask optimization using 3D mask and compact resist models

    NASA Astrophysics Data System (ADS)

    El-Sewefy, Omar; Chen, Ao; Lafferty, Neal; Meiring, Jason; Chung, Angeline; Foong, Yee Mei; Adam, Kostas; Sturtevant, John

    2016-03-01

    Source Mask Optimization (SMO) has played an important role in technology setup and ground rule definition since the 2x nm technology node. While improvements in SMO algorithms have produced higher quality and more consistent results, the accuracy of the overall solution is critically linked to how faithfully the entire patterning system is modeled, from mask down to substrate. Fortunately, modeling technology has continued to advance to provide greater accuracy in modeling 3D mask effects, 3D resist behavior, and resist phenomena. Specifically, the Domain Decomposition Method (DDM) approximates the 3D mask response as a superposition of edge-responses.1 The DDM can be applied to a sectorized illumination source based on Hybrid-Hopkins Abbe approximation,2 which provides an accurate and fast solution for the modeling of 3D mask effects and has been widely used in OPC modeling. The implementation of DDM in the SMO flow, however, is more challenging because the shape and intensity of the source, unlike the case in OPC modeling, is evolving along the optimization path. As a result, it gets more complicated. It is accepted that inadequate pupil sectorization results in reduced accuracy in any application, however in SMO the required uniformity and density of pupil sampling is higher than typical OPC and modeling cases. In this paper, we describe a novel method to implement DDM in the SMO flow. The source sectorization is defined by following the universal pixel sizes used in SMO. Fast algorithms are developed to enable computation of edge signals from each fine pixel of the source. In this case, each pixel has accurate information to describe its contribution to imaging and the overall objective function. A more continuous angular spectrum from 3D mask scattering is thus captured, leading to accurate modeling of 3D mask effects throughout source optimization. This method is applied on a 2x nm middle-of-line layer test case. The impact of the 3D mask model accuracy on

  14. Masking LED hot spots in a thin direct lit backlight unit using semitransparent and perforated masks

    NASA Astrophysics Data System (ADS)

    Rao, Ramachandra; Mos, Barry; Overes, Theo; Langendijk, Erno H. A.

    2014-03-01

    As the demand for thin displays with more features accelerates, the need for backlight systems to become thinner and capable of multiple features increases. Direct lit concepts supporting 2-D dimming provide higher contrast ratios. However masking led hot spots with thinner backlight thicknesses is yet a significant design challenge. Efficient light coupling and recycling mechanisms in combination with relatively high optical efficiencies are key parameters in overall system design. We demonstrate an optimal masking design of the led hot spot for a thin light guide plate in the direct lit architecture. The overall concept system is simulated and prototyped. The resultant performance is discussed.

  15. Removable pellicle for lithographic mask protection and handling

    DOEpatents

    Klebanoff, Leonard E.; Rader, Daniel J.; Hector, Scott D.; Nguyen, Khanh B.; Stulen, Richard H.

    2002-01-01

    A removable pellicle for a lithographic mask that provides active and robust particle protection, and which utilizes a traditional pellicle and two deployments of thermophoretic protection to keep particles off the mask. The removable pellicle is removably attached via a retaining structure to the mask substrate by magnetic attraction with either contacting or non-contacting magnetic capture mechanisms. The pellicle retaining structural is composed of an anchor piece secured to the mask substrate and a frame member containing a pellicle. The anchor piece and the frame member are in removable contact or non-contact by the magnetic capture or latching mechanism. In one embodiment, the frame member is retained in a floating (non-contact) relation to the anchor piece by magnetic levitation. The frame member and the anchor piece are provided with thermophoretic fins which are interdigitated to prevent particles from reaching the patterned area of the mask. Also, the anchor piece and mask are maintained at a higher temperature than the frame member and pellicle which also prevents particles from reaching the patterned mask area by thermophoresis. The pellicle can be positioned over the mask to provide particle protection during mask handling, inspection, and pumpdown, but which can be removed manually or robotically for lithographic use of the mask.

  16. Strategy optimization for mask rule check in wafer fab

    NASA Astrophysics Data System (ADS)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  17. A model of PSF estimation for coded mask infrared imaging

    NASA Astrophysics Data System (ADS)

    Zhang, Ao; Jin, Jie; Wang, Qing; Yang, Jingyu; Sun, Yi

    2014-11-01

    The point spread function (PSF) of imaging system with coded mask is generally acquired by practical measure- ment with calibration light source. As the thermal radiation of coded masks are relatively severe than it is in visible imaging systems, which buries the modulation effects of the mask pattern, it is difficult to estimate and evaluate the performance of mask pattern from measured results. To tackle this problem, a model for infrared imaging systems with masks is presented in this paper. The model is composed with two functional components, the coded mask imaging with ideal focused lenses and the imperfection imaging with practical lenses. Ignoring the thermal radiation, the systems PSF can then be represented by a convolution of the diffraction pattern of mask with the PSF of practical lenses. To evaluate performances of different mask patterns, a set of criterion are designed according to different imaging and recovery methods. Furthermore, imaging results with inclined plane waves are analyzed to achieve the variation of PSF within the view field. The influence of mask cell size is also analyzed to control the diffraction pattern. Numerical results show that mask pattern for direct imaging systems should have more random structures, while more periodic structures are needed in system with image reconstruction. By adjusting the combination of random and periodic arrangement, desired diffraction pattern can be achieved.

  18. Gas Diffusion in Metals: Fundamental Study of Helium-Point Defect Interactions in Iron and Kinetics of Hydrogen Desorption from Zirconium Hydride

    NASA Astrophysics Data System (ADS)

    Hu, Xunxiang

    The behavior of gaseous foreign species (e.g., helium and hydrogen), which are either generated, adsorbed or implanted within the structural materials (e.g., iron and zirconium) exposed to irradiation environments, is an important and largely unsolved topic, as they intensively interact with the irradiation-induced defects, or bond with the lattice atoms to form new compounds, and impose significant effects on their microstructural and mechanical properties in fission and fusion reactors. This research investigates two cases of gas diffusion in metals (i.e., the helium-point defect interactions in iron and kinetics of hydrogen desorption from zirconium hydride) through extensive experimental and modeling studies, with the objective of improving the understanding of helium effects on the microstructures of iron under irradiation and demonstrating the kinetics of hydrogen diffusion and precipitation behavior in zirconium that are crucial to predict cladding failures and hydride fuel performance. The study of helium effects in structural materials aims to develop a self-consistent, experimentally validated model of helium---point defect, defect cluster and intrinsic defects through detailed inter-comparisons between experimental measurements on helium ion implanted iron single crystals and computational models. The combination of thermal helium desorption spectrometry (THDS) experiment with the cluster dynamic model helps to reveal the influence of impurities on the energetics and kinetics of the He-defect interactions and to realize the identification of possible mechanisms governing helium desorption peaks. Positron annihilation spectroscopy is employed to acquire additional information on He-vacancy cluster evolution, which provides an opportunity to validate the model qualitatively. The inclusion of He---self-interstitial clusters extends the cluster dynamic model while MD simulations explore the effects of dislocation loops on helium clustering. In addition, the

  19. Helium isotopes in ferromanganese crusts from the central Pacific Ocean

    USGS Publications Warehouse

    Basu, S.; Stuart, F.M.; Klemm, V.; Korschinek, G.; Knie, K.; Hein, J.R.

    2006-01-01

    Helium isotopes have been measured in samples of two ferromanganese crusts (VA13/2 and CD29-2) from the central Pacific Ocean. With the exception of the deepest part of crust CD29-2 the data can be explained by a mixture of implanted solar- and galactic cosmic ray-produced (GCR) He, in extraterrestrial grains, and radiogenic He in wind-borne continental dust grains. 4He concentrations are invariant and require retention of less than 12% of the in situ He produced since crust formation. Loss has occurred by recoil and diffusion. High 4He in CD29-2 samples older than 42 Ma are correlated with phosphatization and can be explained by retention of up to 12% of the in situ-produced 4He. 3He/4He of VA13/2 samples varies from 18.5 to 1852 Ra due almost entirely to variation in the extraterrestrial He contribution. The highest 3He/4He is comparable to the highest values measured in interplanetary dust particles (IDPs) and micrometeorites (MMs). Helium concentrations are orders of magnitude lower than in oceanic sediments reflecting the low trapping efficiency for in-falling terrestrial and extraterrestrial grains of Fe-Mn crusts. The extraterrestrial 3He concentration of the crusts rules out whole, undegassed 4–40 μm diameter IDPs as the host. Instead it requires that the extraterrestrial He inventory is carried by numerous particles with significantly lower He concentrations, and occasional high concentration GCR-He-bearing particles.

  20. Implantation in IVF.

    PubMed

    Busso, Cristiano E; Melo, Marco A B; Fernandez, Manuel; Pellicer, Antonio; Simon, Carlos

    2006-01-01

    The recent advances in assisted reproduction have made it possible to study and interfere in almost every step of the human reproductive process except for implantation. The most complex and important step remains in great part unknown. Implantation in human has proven to be less efficient compared with other species. However, in in vitro fertilization (IVF) patients, it has been evaluated to be even poorer. This paper highlights the factors related to infertile patients and IVF treatments that can affect implantation and implantation's clinical aspects related to these treatments: implantation failure and early pregnancy loss.