Final report on key comparison APMP.M.P-K13 in hydraulic gauge pressure from 50 MPa to 500 MPa

NASA Astrophysics Data System (ADS)

Kajikawa, Hiroaki; Kobata, Tokihiko; Yadav, Sanjay; Jian, Wu; Changpan, Tawat; Owen, Neville; Yanhua, Li; Hung, Chen-Chuan; Ginanjar, Gigin; Choi, In-Mook

2015-01-01

This report describes the results of a key comparison of hydraulic high-pressure standards at nine National Metrology Institutes (NMIs: NMIJ/AIST, NPLI, NMC/A*STAR, NIMT, NMIA, NIM, CMS/ITRI, KIM-LIPI, and KRISS) within the framework of the Asia-Pacific Metrology Programme (APMP) in order to determine their degrees of equivalence in the pressure range from 50 MPa to 500 MPa in gauge mode. The pilot institute was the National Metrology Institute of Japan (NMIJ/AIST). All participating institutes used hydraulic pressure balances as their pressure standards. A set of pressure balance with a free-deformational piston-cylinder assembly was used as the transfer standard. Three piston-cylinder assemblies, only one at a time, were used to complete the measurements in the period from November 2010 to January 2013. Ten participants completed their measurements and reported the pressure-dependent effective areas of the transfer standard at specified pressures with the associated uncertainties. Since one of the participants withdrew its results, the measurement results of the nine participants were finally compared. The results were linked to the CCM.P-K13 reference values through the results of two linking laboratories, NMIJ/AIST and NPLI. The degrees of equivalence were evaluated by the relative deviations of the participants' results from the CCM.P-K13 key comparison reference values, and their associated combined expanded (k=2) uncertainties. The results of all the nine participating NMIs agree with the CCM.P-K13 reference values within their expanded (k=2) uncertainties in the entire pressure range from 50 MPa to 500 MPa. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

KEY COMPARISON: Final report of APMP.T-K6 (original name APMP-IC-1-97): Comparison of humidity measurements using a dew point meter as a transfer standard

NASA Astrophysics Data System (ADS)

Li, Wang; Takahashi, C.; Hussain, F.; Hong, Yi; Nham, H. S.; Chan, K. H.; Lee, L. T.; Chahine, K.

2007-01-01

This APMP key comparison of humidity measurements using a dew point meter as a transfer standard was carried out among eight national metrology institutes from February 1999 to January 2001. The NMC/SPRING, Singapore was the pilot laboratory and a chilled mirror dew point meter offered by NMIJ was used as a transfer standard. The transfer standard was calibrated by each participating institute against local humidity standards in terms of frost and dew point temperature. Each institute selected its frost/dew point temperature calibration points within the range from -70 °C to 20 °C frost/dew point with 5 °C step. The majority of participating institutes measured from -60 °C to 20 °C frost/dew point and a simple mean evaluation was performed in this range. The differences between the institute values and the simple means for all participating institutes are within two standard deviations from the mean values. Bilateral equivalence was analysed in terms of pair difference and single parameter Quantified Demonstrated Equivalence. The results are presented in the report. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

SUPPLEMENTARY COMPARISON: Final report on supplementary comparison APMP-T-S3-03 of industrial platinum resistance and liquid in glass thermometers from -40 °C to 250 °C

NASA Astrophysics Data System (ADS)

Norranim, Uthai; Nguyen, Mong Kim; Ballico, Mark J.

2007-01-01

Industrial thermometers such as industrial platinum resistance thermometers (iprts) and liquid-in-glass thermometers (LIGTs) are widely used in industry. Because Key Comparisons are limited to direct realizations of ITS-90, and not all APMP NMIs have participated in them, the national metrology institutes (NMIs) of Thailand and Australia (NIMT and NIMA) organized an APMP supplementary comparison to support the approval of CMCs (calibration and measurement capabilities) for these laboratories. The comparison, performed in 2003, covered the range from -40.0 °C to 250.0 °C, using IPRTs (Hart Scientific 5626-12-S), total immersion (ASTM 62C, 120C) and partial immersion (ASTM 40C) LIGTs. Ten NMIs from the APMP: KIM-LIPI (Indonesia), ITDI (Philippines), MSL (New Zealand), NBSM (Nepal), NMIA (Australia), NIMT (Thailand), SCL (Hong Kong), SIRIM (Malaysia), SPRING (Singapore) and VMI (Vietnam) were divided into two loops to shorten the circulation time, and these were linked by the two pilot laboratories. This report describes details of the artifacts, the circulation schedule, the measurement procedures, the results submitted by participants, uncertainties and the analysis of the results. Reference values calculated using simple mean, median and weighted mean were consistent with each other, but as the Birge criterion was satisfied, the weighted mean with its lower uncertainty was adopted. The artifacts were found to be stable over the comparison and the results of the loop linking labs consistent, allowing an uncertainty of 2 mK to 4 mK to be achieved for the IPRT reference value and 10 mK to 20 mK for the LIGT reference values. These uncertainties allowed the comparison data to be used to adequately test the uncertainties of all the participant laboratories, and hence to directly support their CMC claims. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

SUPPLEMENTARY COMPARISON: Final report on Supplementary Comparison APMP.M.H-S1

NASA Astrophysics Data System (ADS)

Kongkavitool, Rugkanawan; Hattori, Koichiro; Sanh, Vo; Yen, Lim Gin

2007-01-01

This report presents the results of supplementary comparison APMP.M.H-S1 among four national metrology institutes (NIMT, NMIJ/AIST, VMI and SPRING). The comparison was carried out during October 2004 to January 2005 in order to determine the capability of the primary Rockwell hardness standard, including standard conditions, of each participant, to confirm the accuracy of Rockwell hardness scale C measurement declared by the participant, which includes the effect of each participant's primary indenter and determine the degrees of equivalence of hardness scale measurement in the range 20 HRC to 60 HRC. Furthermore, the comparison was carried out a by common indenter, which was provided by the pilot institute, in order to determine the measurement capability of the participant's primary machine without the influence of the indenter, as a study of scientific purpose. The pilot institute was the National Institute of Metrology (Thailand), NIMT. There were two sets of artifacts for the comparison. Each set was composed of nine hardness blocks: 20 HRC, 25 HRC, 30 HRC, 35 HRC, 40 HRC, 45 HRC, 50 HRC, 55 HRC, 60 HRC. The verification of the participant's primary Rockwell hardness machine was carried out according to ISO6508-3 before making the measurement. The pilot institute made measurements at the beginning and the end of the comparison in order to monitor the stability of the artifacts. The degree of equivalence of each national primary hardness standard was expressed quantitatively by two terms, the deviation from KCRV and the uncertainty of this deviation at a 95% level of confidence. The En parameter was calculated to express the equivalence between the measurements of participants as well. The degree of equivalence between pairs of participating institutes was expressed by the difference of their deviations from the key comparison reference value and the uncertainty of this difference at the 95% level of confidence. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Final report on supplementary comparison APMP.M.P-S6 in gas gauge pressure from 10 MPa to 100 MPa

NASA Astrophysics Data System (ADS)

Kajikawa, Hiroaki; Olson, Douglas A.; Iizumi, Hideaki; Driver, Robert Greg; Kojima, Momoko

2016-01-01

A supplementary comparison of gas high-pressure standards was conducted between the National Metrology Institute of Japan (NMIJ/AIST) and the National Institute of Standards and Technology (NIST), within the framework of the Asia-Pacific Metrology Programme (APMP), in order to determine their degrees of equivalence in the pressure range from 10 MPa to 100 MPa in gauge mode. The pilot institute was NMIJ/AIST. The measurements were carried out from July 2014 to October 2014. Both participating institutes used pressure balances as their pressure standards. Different gases were used for the pressure medium: NMIJ/AIST used Nitrogen, while NIST used Helium. A set of two pressure monitors was used as the transfer standard. The pressure monitors were found sufficiently stable during the measurements. Characteristics of the pressure monitors were evaluated at the pilot institute, and then used for data corrections and uncertainty estimations. In particular, the effect of the gas medium on the pressure monitors was found to be significant, and then all the measurement data were corrected to those with Nitrogen. The degrees of equivalence between the two institutes were evaluated by the relative differences of the participant's results and their associated expanded (k = 2) uncertainties. The gas pressure standards in the range 10 MPa to 100 MPa for gauge mode of the two participating institutes were found to be equivalent within their claimed uncertainties. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Angle comparison using an autocollimator

NASA Astrophysics Data System (ADS)

Geckeler, Ralf D.; Just, Andreas; Vasilev, Valentin; Prieto, Emilio; Dvorácek, František; Zelenika, Slobodan; Przybylska, Joanna; Duta, Alexandru; Victorov, Ilya; Pisani, Marco; Saraiva, Fernanda; Salgado, Jose-Antonio; Gao, Sitian; Anusorn, Tonmueanwai; Leng Tan, Siew; Cox, Peter; Watanabe, Tsukasa; Lewis, Andrew; Chaudhary, K. P.; Thalmann, Ruedi; Banreti, Edit; Nurul, Alfiyati; Fira, Roman; Yandayan, Tanfer; Chekirda, Konstantin; Bergmans, Rob; Lassila, Antti

2018-01-01

Autocollimators are versatile optical devices for the contactless measurement of the tilt angles of reflecting surfaces. An international key comparison (KC) on autocollimator calibration, EURAMET.L-K3.2009, was initiated by the European Association of National Metrology Institutes (EURAMET) to provide information on the capabilities in this field. The Physikalisch-Technische Bundesanstalt (PTB) acted as the pilot laboratory, with a total of 25 international participants from EURAMET and from the Asia Pacific Metrology Programme (APMP) providing measurements. This KC was the first one to utilise a high-resolution electronic autocollimator as a standard. In contrast to KCs in angle metrology which usually involve the full plane angle, it focused on relatively small angular ranges (+/-10 arcsec and +/-1000 arcsec) and step sizes (10 arcsec and 0.1 arcsec, respectively). This document represents the approved final report on the results of the KC. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCL, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Final report on APMP supplementary comparison of industrial platinum resistance thermometer for range -50 °C to 400 °C. (APMP.T-S6)

NASA Astrophysics Data System (ADS)

Ali, Nurulaini Md; Othman, Hafidzah; Ho, Mong-Kim; Yang, Inseok; Gabi, Victor; Zhang, Zhe; Sheng, Ying; Hu, Jing; Zhang, Jintao; Tsai, Shu-Fei; Liao, Su-Chuion; Shafiqul Alam, Md; Norranim, Uthai; Yaokulbodee, Charuayrat; Liedberg, Hans; Gamal Ahmed, Mohamed; Harba, Naser; Fuad Flaifel, Mustafa; Suherlan; Achmadi, Aditya; Haoyuan, Kho; Yan, Fan; Boon Kwee, Neoh; Thanh Binh, Pham; Ragay, Monalisa

2017-01-01

The National Metrology Laboratory, Malaysia (NML-SIRIM) had coordinated the Supplementary Comparison of Industrial Platinum Resistance Thermometer (IPRT) started from July 2009 until April 2011 together with the National Measurement Institute of Australia (NMIA) and Korea Research Institute of Standards and Science (KRISS). This comparison was opened to all APMP members and 16 participants had taken part in order to consolidate or improve their calibration and measurement capabilities (CMCs). Three units of artefacts 100-ohm IPRT belonging to NML-SIRIM, NMIA and KRISS were used and three loops of measurement were run in parallel to shorten the circulation time. The stability of artefacts was monitored with initial and final ice point measurement by each laboratory. The participants need to perform measurement at temperature points (0,-50,-30, 0, 100, 200, 300, 400,0) °C. All submitted data were compiled and adjusted at nominal temperature and by using the linkage from NMIA and KRISS as reference value for all three loops , the temperature deviation from participants from different loops can be compared. The approach of Birge Ratio for final exclusion comprised all the excluded results from the analysis of each loop and the measurement performance for each participant were summarized by the En number value. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

SUPPLEMENTARY COMPARISON: APMP.EM-S6: Bilateral supplementary comparison of resistance

NASA Astrophysics Data System (ADS)

Charoensook, Ajchara; Jassadajin, Chaiwat; Chen, Henry; Ricketts, Brian

2004-01-01

A bilateral supplementary comparison of resistance, APMP.EM-S6, was conducted between the National Institute of Metrology Thailand (NIMT) and the CSIRO National Measurement Laboratory of Australia (NML). The comparison covered seven values of resistance, 0.1 Ω, 1 Ω, 100 Ω, 10 kΩ, 100 kΩ, 1 MΩ and 100 MΩ. The 0.1 Ω resistor was a YEW type 2792, the 100 MΩ resistor was an IET type SRC and the other five resistors were Fluke type 742A. The resistors were supplied by NIMT, and NML was the pilot laboratory for the comparison. The measurements for the comparison were made between December 2003 and April 2004. The resistors were measured on three separate occasions by NIMT and between each of these occasions the resistors were sent to NML for measurement. The resistors of nominal values 0.1 Ω, 1 Ω, 100 Ω and 10 kΩ were measured as four-terminal resistors while the 100 kΩ, 1 MΩ and 100 MΩ resistors were measured as two-terminal resistors. The quantity En (the absolute value of the difference between the values obtained at the two laboratories divided by the root sum square of the expanded uncertainties of the two values) was calculated for each resistance value used in the comparison. In all cases En was less than 0.5. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the Mutual Recognition Arrangement (MRA).

SUPPLEMENTARY COMPARISON: Final report of the bilateral comparison APMP.M.H-S2 of hardness measurement for Rockwell scales A and B between PTB and NIMT

NASA Astrophysics Data System (ADS)

Sanponpute, Tassanai; Meesaplak, Apichaya; Herrmann, Konrad; Menelao, Febo

2009-01-01

The bilateral comparison APMP.M.H-S2 of hardness measurement for Rockwell scales A and B was arranged by the National Institute of Metrology of Thailand, NIMT, as the pilot laboratory, comparing with Physikalisch-Technische Bundesanstalt of Germany, PTB. The objective of this comparison was to confirm the calibration and measurement capabilities of NIMT in hardness measurement. The period of measurement covered March to August 2009. There were two sets of artefacts: scale A artefact set and scale B artefact set. The scale A artefact set consisted of seven hardness blocks: 35 HRA, 40 HRA, 55 HRA, 60 HRA, 70 HRA, 80 HRA, 85 HRA. The artefact set for scale B consisted of nine hardness blocks: 25 HRB, 30 HRB, 40 HRB, 50 HRB, 60 HRB, 70 HRB, 80 HRB, 90 HRB, 100 HRB. Laboratories had to ensure that the primary Rockwell hardness machines passed the verification process according to ISO 6508-3. Then participants measured the hardness value by making ten indentations in a designated area of each artefact block. Hardness measurement results and uncertainty budget were then reported to the pilot laboratory and were used to compute the degrees of equivalence in terms of the Comparison Reference Value (CRV) and En ratio. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Standardization of ¹³¹I: implementation of CIEMAT/NIST method at BARC, India.

PubMed

Kulkarni, D B; Anuradha, R; Reddy, P J; Joseph, Leena

2011-10-01

The CIEMAT/NIST efficiency tracing method using ³H standard was implemented at Radiation Safety Systems Division, Bhabha Atomic Research Centre (BARC) for the standardization of ¹³¹I radioactive solution. Measurements were also carried out using the 4π β-γ coincidence counting system maintained as a primary standard at the laboratory. The implementation of the CIEMAT/NIST method was verified by comparing the activity concentration obtained in the laboratory with that of the average value of the APMP intercomparison (Yunoki et al., in progress, (APMP.RI(II)-K2.I-131)). The results obtained by the laboratory is linked to the CIPM Key Comparison Reference Value (KCRV) through the equivalent activity value of National Metrology Institute of Japan (NMIJ) (Yunoki et al., in progress, (APMP.RI(II)-K2.I-131)), which was the pilot laboratory for the intercomparison. The procedure employed to standardize ¹³¹I by the CIEMAT/NIST efficiency tracing technique is presented. The activity concentrations obtained have been normalized with the activity concentration measured by NMIJ to maintain confidentiality of results until the Draft-A report is accepted by all participants. The normalized activity concentrations obtained with the CIEMAT/NIST method was 0.9985 ± 0.0035 kBq/g and using 4π β-γ coincidence counting method was 0.9909 ± 0.0046 kBq/g as on 20 March 2009, 0 h UTC. The normalized activity concentration measured by the NMIJ was 1 ± 0.0024 kBq/g. The normalized average of the activity concentrations of all the participating laboratories was 1.004 ± 0.028 kBq/g. The results obtained in the laboratory are comparable with the other international standards within the uncertainty limits. Copyright © 2011 Elsevier Ltd. All rights reserved.

Final report on key comparison APMP.M.P-K3: Absolute pressure measurements in gas from 3 × 10-6 Pa to 9 × 10-4 Pa

NASA Astrophysics Data System (ADS)

Yoshida, H.; Arai, K.; Akimichi, H.; Hong, S. S.; Song, H. W.

2011-01-01

The results of a key comparison of ultra-high vacuum standards at two national metrology institutes (NMIJ/AIST and KRISS) are reported. This bilateral comparison was carried out from May 2010 to October 2010 within the framework of the Asia-Pacific Metrology Programme (APMP) to determine their degrees of equivalence at pressures in the range from 3 × 10-6 Pa to 9 × 10-4 Pa. The pilot institute was NMIJ/AIST. Two spinning rotor gauges and two hot cathode ionization gauges were used as the transfer standards. NMIJ/AIST used two calibration systems: the dynamic expansion system (NMIJ-DES) and two-stage flow-dividing system (NMIJ-TFS). KRISS used the dynamic expansion system. The transfer standards were sufficiently stable to meet the requirements of the comparison compared with those of previous international comparisons owing to some improvements of the protocol and the transfer standards. The ultra-high vacuum standards of NMIJ/AIST and KRISS were found to be equivalent within their claimed uncertainties in the range from 3 × 10-6 Pa to 9 × 10-5 Pa. The NMIJ-DES results, which have smaller uncertainty than NMIJ-TFS, were transferred to the corresponding CCM key comparison, CCM.P-K3, in the range from 3 × 10-6 Pa to 9 × 10-5 Pa and it is shown that the NMIJ values were equivalent to the CCM key comparison reference value within the claimed uncertainties. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Final report of APMP.QM-S6: clenbuterol in porcine meat

NASA Astrophysics Data System (ADS)

Sin, D. W.-M.; Ho, C.; Yip, Y.-C.

2016-01-01

At the CCQM Organic Analysis Working Group (OAWG) Meeting held in April 2012 and the APMP TCQM Meeting held in November 2012, an APMP supplementary comparison (APMP.QM-S6) on the determination of clenbuterol in porcine meat was supported by the OAWG and APMP TCQM. This comparison was organized by the Government Laboratory, Hong Kong. In order to accommodate a wider participation, a pilot study (APMP.QM-P22) was run in parallel to APMP.QM-S6. This study provided the means for assessing the measurement capabilities for determination of low-polarity measurands in a procedure that requires extraction, clean-up, analytical separation, and selective detection in a food matrix. A total of 7 institutes registered for the supplementary comparison and 6 of them submitted their results. 4 results were included for SCRV calculation. All participating laboratories applied Isotope Dilution Liquid Chromatography-Tandem Mass Spectrometry (ID-LCMS/MS) technique with clenbuterol-d9 as internal standard spiked for quantitation in this programme. KEY WORDS FOR SEARCH APMP.QM-S6 and Clenbuterol Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

SUPPLEMENTARY COMPARISON: Final report on APMP.PR-S1.1: Bilateral comparison of irradiance responsivity of UVA detectors

NASA Astrophysics Data System (ADS)

Huang, Xuebo

2009-01-01

In order to assess the performance of the standards and techniques used for calibration and measurement of UVA irradiance responsivity of photodetectors in NMISA, South Africa, a new comparison was decided as a follow-up to comparison APMP.PR-S1. It is registered in the Key Comparison Data Base (KCDB) of BIPM as a bilateral supplementary comparison, with the identifier APMP.PR-S1.1. The comparison was carried out following the same technical protocol as that of supplementary comparison APMP PR-S1. The principle, organization and method of the comparison, as well as the preliminary measurements at the pilot laboratory NMC-A*STAR Singapore, were described in the Final Report of the APMP.PR-S1 comparison. The results of this bilateral comparison show that the NMISA's results lie within ±2% against the comparison reference values of APMP.PR-S1, which is a great improvement. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Final report on APMP.M.P-S4: Results of the bilateral supplementary comparison on pressure measurements in the range (60 to 350) kPa of gauge pressure in gas media

NASA Astrophysics Data System (ADS)

Priruenrom, T.; Sabuga, W.; Konczak, T.

2013-01-01

The bilateral supplementary comparison APMP.M.P-S4 on pressure measurements in the range (60 to 350) kPa of gauge pressure in gas media was organized by National Institute of Metrology of Thailand, NIMT, as the pilot laboratory, comparing with Physikalisch-Technische Bundesanstalt of Germany, PTB. The objective of this comparison is to check equivalence of gas pressure standards between NIMT and PTB. The period of measurement covered November to December 2012. NIMT provided a transfer standard, which was a WC-WC piston-cylinder assembly (PCA) with a nominal effective area of 10 cm2 manufactured by Fluke Corporation, DHI. The measurements were performed at pressures (60, 100, 150, 200, 250, 300 and 350) kPa. The NIMT laboratory standard used was a pressure balance with a PCA of 10 cm2 manufactured by DHI and identified by serial number 0693. The PTB laboratory standard used was a pressure balance with a PCA of 10 cm2 manufactured by Desgranges et Huot (DH) and identified by serial number 288. The results of this comparison show that the relative difference of the effective area values obtained by NIMT and PTB is not larger than 4.3 ppm, which corresponds to En = 0.26. Therefore, it confirms that the gas pressure standards maintained by the two institutes, NIMT and PTB, in the pressure range (60 to 350) kPa in gauge mode are equivalent under their uncertainties claimed. The result of this comparison is essential to support the calibration and measurement capabilities (CMC) of NIMT in this pressure range. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

APMP Pilot Study on Transmittance Haze

NASA Astrophysics Data System (ADS)

Liu, Wen-Chun; Hwang, Jisoo; Koo, Annette; Wu, Houping; Leecharoen, Rojana; Yu, Hsueh-Ling

2018-02-01

Five NMIs within APMP, including CMS/ITRI, MSL, NIM, NIMT and KRISS from TCPR applied to the APMP technical committee initiative project for funding to carry out a pilot comparison of transmittance haze in 2012. The project started in 2014 and the final report was completed at the end of 2016. In this pilot comparison, three different haze standards were adopted, and transmittance haze for each standard was measured according to ASTM D1003 or ISO 14782. This paper presents the first results of an APMP pilot study of transmittance haze and the analysis of the variation among different haze measurement systems which are commonly used. The study shows that the variables such as sphere multiplier, transmittance distribution, fluorescence of samples and optical path of the incident beam cause discrepancies among NMIs and highlight deficiencies in current documentary standards.

Production of atmospheric pressure microwave plasma with dielectric half-mirror resonator and its application to polymer surface treatment

NASA Astrophysics Data System (ADS)

Sasai, Kensuke; Keyamura, Kazuki; Suzuki, Haruka; Toyoda, Hirotaka

2018-06-01

For the surface treatment of a polymer tube, a ring-shaped atmospheric pressure microwave plasma (APMP) using a coaxial waveguide is studied. In this APMP, a dielectric plate is used not only as a partial mirror for cavity resonation but also for the precise alignment of the discharge gap for ring-shaped plasma production. The optimum position of the dielectric plate is investigated by electromagnetic wave simulation. On the basis of simulation results, a ring-shaped plasma with good uniformity along the ring is produced. The coaxial APMP is applied to the surface treatment of ethylene tetrafluoroethylene. A very fast surface modification within 3 s is observed.

Final report on APMP.T-K7.1 key comparison of water triple point cells, bilateral NMIJ-VMI

NASA Astrophysics Data System (ADS)

Yamazawa, Kazuaki; Nakano, Tohru; Thanh Binh, Pham

2018-01-01

APMP.T-K7.1, was held from July 2014 to May 2015 to compare the national realizations of the water triple point between NMIJ (Japan) and VMI (Vietnam). To reach the objective, VMI sent a transfer cell to NMIJ and stated a value for the temperature difference of the transfer cell, relative to the corresponding national standard, representing 273.16 K. This report presents the results of the TPW comparison, gives detailed information about the measurements made at the NMIJ and at the VMI, and aims to link the results of APMP.T-K7.1 to APMP.T-K7 and CCT-K7. The results of this key comparison are also represented in the form of degrees of equivalence for the purposes of the MRA. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Final report on APMP.M.P-S3: Results of the supplementary comparison in gas media in the range 1.77 MPa to 6.8 MPa

NASA Astrophysics Data System (ADS)

Owen, N.; Bergoglio, M.

2013-01-01

This report provides the results of the supplementary bilateral comparison APMP.M.P-S3 between NMI Australia (NMIA) and INRIM, Italy executed from November 2010 to November 2011. NMIA acted as the pilot laboratory and provided a Ruska G series piston gauge as the transfer standard, with a nominal area 16.8 mm2 requiring a nominal load of 12 kg to balance a pressure of 7.0 MPa. The purpose of this supplementary bilateral comparison was to provide data for linking NMIA to CCM.P-K1.c in the pressure range greater than 4 MPa to extend the range covered by key comparison APMP.M.P-K1c. The original protocol called for the pressure range from 80 kPa to 6.80 MPa. Both participants agreed to limit this comparison range to 1.77 MPa to 6.50 MPa. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

APMP supplementary comparison (APMP.L-S8) measurement of flatness of optical flat by interferometry

NASA Astrophysics Data System (ADS)

Buajarern, J.; Bitou, Y.; Zi, X.; Zhao, L.; Swift, N.; Agarwal, A.; Hungwe, F.

2018-01-01

A reginal supplementary comparison, APMP.L-S8, was started in 2015 to demonstrate the equivalence of routine calibration services offered by NMIs to clients. Participants in this APMP.L-S8 comparison agreed to apply interferometric method for flatness measurement of the optical flats. There are two configurations of flatness interferometer used in this comparison, vertical type and horizontal type. There are seven laboratories from NMIs participated this supplementary comparison which included NIMT, NMIJ, NIM, NMC/A*STAR, MSL, NPLI and NMISA. This report describes the measurement results of two optical flats, diameter of 70 mm and 160 mm. The calibrations of this comparison were carried out by participants during the period from July 2015 to September 2016. The results show that there is a degree of equivalence below 1 for all measurands. Hence, there is a close agreement between the measurements from all participants. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCL, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Report on NIM-NMC bilateral comparison: SPRT calibration comparison from -190°C to 420°C

NASA Astrophysics Data System (ADS)

Sun, Jianping; Ye, Shaochun; Wang, Li; Zhang, Jintao; Kho, Haoyuan

2016-01-01

A bilateral comparison of local realization of the International temperature scale of 1990 (ITS-90) between National Institute of Metrology (NIM) and National Metrology Centre (NMC) was carried out over the temperature range from -190°C to 420°C. It involved six fixed points including the argon triple point, the mercury triple point, the triple point of water, the melting point of gallium, the freezing point of tin and the freezing point of zinc. In 2009, NMC asked NIM to participate in a bilateral comparison to link the NMC results to the Consultative Committee for Thermometry Key comparison 3 (CCT-K3) and facilitate the NMC's Calibration and measurement capabilities (CMCs) submission. This comparison was agreed by NIM and Asia Pacific Metrology Programme (APMP) in 2009, and registered in the Key Comparison Database (KCDB) in 2010 as CCT-K3.2. NMC supplied two 25 Ω fused silica sheath standard platinum resistance thermometers (SPRTs) as traveling standards. One of them was used at the Ga, Sn and Zn fixed points, while the other one was used at the Ar and Hg fixed point. NMC measured them before and after NIM measurement. During the comparison, a criterion for the SPRT was set as the stability at the triple point of water to be less than 0.3 mK. The results for both laboratories are summarized. A proposal for linking the NMC's comparison results to CCT-K3 is presented. The difference between NMC and NIM and the difference between NMC and the CCT-K3 Average Reference Value (ARV) using NIM as a link are reported with expanded uncertainties at each measured fixed point. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Final report on APMP.T-K7 key comparison of water triple point cells

NASA Astrophysics Data System (ADS)

Tsai, S. F.; White, R.; Tamba, J.; Yamazawa, K.; Ho, M. K.; Tsui, C. M.; Zaid, G.; Achmadi, A.; Gam, K. S.; Othman, H.; Ali, N. M.; Yuan, K. H.; Shaochun, Y.; Liedberg, H.; Yaokulbodee, C.

2016-01-01

APMP.T-K7, was held from February 2008 to September 2009 to compare the national realizations of the water triple point among eleven NMIs. To reach the objective, each participating laboratory sent a transfer cell to CMS and stated a value for the temperature difference of the transfer cell, relative to the corresponding national standard, representing 273.16 K. CMS (Taiwan) organized the comparison, with the support from co-pilot institutes MSL (New Zealand) and NMIJ (Japan). The other eight participating laboratories included NMIA, SCL, KIM-LIPI, KRISS, NMIM/SIRIM, NMC, NMISA, and NIMT. This report presents the results of the TPW comparison, gives detailed information about the measurements made at the CMS and at the participating laboratories, and aims to link the results of APMP.T-K7 to CCT-K7. The results of this key comparison are also represented in the form of degrees of equivalence for the purposes of the MRA. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

APMP.T-K3.4: key comparison of realizations of the ITS-90 over the range -38.8344 °C to 419.527 °C

NASA Astrophysics Data System (ADS)

Joung, W.; Gam, K. S.; Achmadi, A.; Trisna, B. A.

2016-01-01

The APMP bilateral key comparison APMP.T-K3.4 was initiated on the request from RCM-LIPI (Indonesia) to link their national standards to the average reference values (ARVs) of the CCT-K3. Korea Research Institute of Standards and Science (KRISS, Republic of Korea) provided the linkage to the CCT-K3 for temperatures ranging from -38.8344 °C to 419.527 °C. In the APMP.T-K3.4, two standard platinum resistance thermometers (SPRTs) were chosen as the transfer instruments and were calibrated at the ITS-90 fixed-points in the comparison range. The fixed-points in this comparison included Zn freezing point (419.527 °C), Sn freezing point (231.928 °C), In freezing point (156.5985 °C), Ga melting point (29.7646 °C), and Hg triple point (-38.8344 °C). The comparison was carried out in a participant-pilot-participant sequence where KRISS served as the pilot. The linkage was based on the fixed-point resistance ratios of RCM-LIPI relative to the ARVs of the CCT-K3 via the difference between the fixed-point resistance ratios of KRISS and the ARVs of the CCT-K3. The temperature differences between the national standards of RCM-LIPI and the ARVs of the CCT-K3 were within the evaluated comparison uncertainties of the ATPM.T-K3.4. This report provides detailed information on the comparison results, linkage mechanism, and the Degree of Equivalence of the RCM-LIPI relative to the institutes having participated in the CCT-K3. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Laser metrology and optic active control system for GAIA

NASA Astrophysics Data System (ADS)

D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

2017-11-01

The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

NASA metrology and calibration, 1993

NASA Technical Reports Server (NTRS)

1993-01-01

Th sixteenth annual workshop of NASA's Metrology and Calibration Working Group was held April 20-22, 1993. The goals of the Working Group are to provide Agencywide standardization of individual metrology programs, where appropriate; to promote cooperation and exchange of information within NASA, with other Government agencies, and with industry; to serve as the primary Agency interface with the National Institute of Standards and Technology; and to encourage formal quality control techniques such as Measurement Assurance Programs. These proceedings contain unedited reports and presentations from the workshop and are provided for information only.

Assessment of the present NASA optical metrology capabilities and recommendations for establishing an in-house NASA Optical Metrology Group

NASA Technical Reports Server (NTRS)

Parks, Robert E.

1991-01-01

An investigation into when it was first recognized that there was a deficiency in NASA optical metrology oversight capability, why this deficiency existed unnoticed for so long, and a proposal for correcting the problem is presented. It is explained why this optical metrology oversight is so critical to program success and at the same time, why it is difficult to establish due to the nature of the technology. The solution proposed is the establishment of an Optics Metrology Group within the NASA/MSFC Optics Branch with a line of authority from NASA S & MA.

Implementation of primary low-g shock standard for laser interferometry

NASA Astrophysics Data System (ADS)

Sun, Qiao; Wang, Jian-lin; Hu, Hong-bo

2015-02-01

This paper presents the novel implementation of a primary standard for low-g shock acceleration calibration based on rigid body collision using laser interferometry at National Institute of Metrology (NIM), China. The combination of an electromagnetic exciter and a pneumatic exciter as mechanical power supply of the shock excitation system are built up to achieve a wider acceleration range. Three types of material for shock pulse generators between airborne anvil and hammer are investigated and compared in the aspects of pulse shapes and acceleration levels. A heterodyne He-Ne laser interferometer is employed for precise measurement of shock acceleration with less electronic and mechanical influences from both the standard device itself and its surroundings. For signal acquisition and processing, virtual instrument technology is used to build up data acquisition PXI hardware from National Instrument and calibration software developed by LabVIEW. Some calibration results of a standard accelerometer measuring chain are shown accompany with the uncertainty evaluation budget. The expanded calibration uncertainty of shock sensitivity of the accelerometer measuring chain is 0.8%, k=2, with the peak range of half-sine squared acceleration shape from 20m/s2 to 10000 m/s2 and pulse duration from 0.5 ms to 10 ms. This primary shock standard can meet the traceability requirements of shock acceleration from various applications of industries from automobile to civil engineering and is used for piloting ongoing international shock comparison APMP.AUV.V-P1.

Preclinical medical students’ understandings of academic and medical professionalism: visual analysis of mind maps

PubMed Central

Rees, Charlotte E

2017-01-01

Introduction Several studies have begun to explore medical students’ understandings of professionalism generally and medical professionalism specifically. Despite espoused relationships between academic (AP) and medical professionalism (MP), previous research has not yet investigated students’ conceptualisations of AP and MP and the relationships between the two. Objectives The current study, based on innovative visual analysis of mind maps, therefore aims to contribute to the developing literature on how professionalism is understood. Methods We performed a multilayered analysis of 98 mind maps from 262 first-year medical students, including analysing textual and graphical elements of AP, MP and the relationships between AP and MP. Results The most common textual attributes of AP were learning, lifestyle and personality, while attributes of MP were knowledge, ethics and patient-doctor relations. Images of books, academic caps and teachers were used most often to represent AP, while images of the stethoscope, doctor and red cross were used to symbolise MP. While AP-MP relations were sometimes indicated through co-occurring text, visual connections and higher-order visual metaphors, many students struggled to articulate the relationships between AP and MP. Conclusions While the mind maps’ textual attributes shared similarities with those found in previous research, suggesting the universality of some professionalism attributes, our study provides new insights into students’ conceptualisations of AP, MP and AP-MP relationships. We encourage medical educators to help students develop their understandings of AP, MP and AP-MP relationships, plus consider the feasibility and value of mind maps as a source of visual data for medical education research. PMID:28821520

Preclinical medical students' understandings of academic and medical professionalism: visual analysis of mind maps.

PubMed

Janczukowicz, Janusz; Rees, Charlotte E

2017-08-18

Several studies have begun to explore medical students' understandings of professionalism generally and medical professionalism specifically. Despite espoused relationships between academic (AP) and medical professionalism (MP), previous research has not yet investigated students' conceptualisations of AP and MP and the relationships between the two. The current study, based on innovative visual analysis of mind maps, therefore aims to contribute to the developing literature on how professionalism is understood. We performed a multilayered analysis of 98 mind maps from 262 first-year medical students, including analysing textual and graphical elements of AP, MP and the relationships between AP and MP. The most common textual attributes of AP were learning, lifestyle and personality, while attributes of MP were knowledge, ethics and patient-doctor relations. Images of books, academic caps and teachers were used most often to represent AP, while images of the stethoscope, doctor and red cross were used to symbolise MP. While AP-MP relations were sometimes indicated through co-occurring text, visual connections and higher-order visual metaphors, many students struggled to articulate the relationships between AP and MP. While the mind maps' textual attributes shared similarities with those found in previous research, suggesting the universality of some professionalism attributes, our study provides new insights into students' conceptualisations of AP, MP and AP-MP relationships. We encourage medical educators to help students develop their understandings of AP, MP and AP-MP relationships, plus consider the feasibility and value of mind maps as a source of visual data for medical education research. © Article author(s) (or their employer(s) unless otherwise stated in the text of the article) 2017. All rights reserved. No commercial use is permitted unless otherwise expressly granted.

A new way of measuring wiggling pattern in SADP for 3D NAND technology

NASA Astrophysics Data System (ADS)

Mi, Jian; Chen, Ziqi; Tu, Li Ming; Mao, Xiaoming; Liu, Gong Cai; Kawada, Hiroki

2018-03-01

A new metrology method of quantitatively measuring wiggling patterns in a Self-Aligned Double Patterning (SADP) process for 2D NAND technology has been developed with a CD-SEM metrology program on images from a Review-SEM system. The metrology program provided accurate modeling of various wiggling patterns. The Review-SEM system provided a-few-micrometer-wide Field of View (FOV), which exceeds precision-guaranteed FOV of a conventional CD-SEM. The result has been effectively verified by visual inspection on vertically compressed images compared with Wiggling Index from this new method. A best-known method (BKM) system has been developed with connected HW and SW to automatically measure wiggling patterns.

Laser and Optical Fiber Metrology in Romania

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sporea, Dan; Sporea, Adelina

2008-04-15

The Romanian government established in the last five years a National Program for the improvement of country's infrastructure of metrology. The set goal was to develop and accredit testing and calibration laboratories, as well as certification bodies, according to the ISO 17025:2005 norm. Our Institute benefited from this policy, and developed a laboratory for laser and optical fibers metrology in order to provide testing and calibration services for the certification of laser-based industrial, medical and communication products. The paper will present the laboratory accredited facilities and some of the results obtained in the evaluation of irradiation effects of optical andmore » optoelectronic parts, tests run under the EU's Fusion Program.« less

MSFC Optical Metrology: A National Resource

NASA Technical Reports Server (NTRS)

Burdine, Robert

1998-01-01

A national need exists for Large Diameter Optical Metrology Services. These services include the manufacture, testing, and assurance of precision and control necessary to assure the success of large optical projects. "Best Practices" are often relied on for manufacture and quality controls while optical projects are increasingly more demanding and complex. Marshall Space Flight Center (MSFC) has acquired unique optical measurement, testing and metrology capabilities through active participation in a wide variety of NASA optical programs. An overview of existing optical facilities and metrology capabilities is given with emphasis on use by other optical projects. Cost avoidance and project success is stressed through use of existing MSFC facilities and capabilities for measurement and metrology controls. Current issues in large diameter optical metrology are briefly reviewed. The need for a consistent and long duration Large Diameter Optical Metrology Service Group is presented with emphasis on the establishment of a National Large Diameter Optical Standards Laboratory. Proposals are made to develop MSFC optical standards and metrology capabilities as the primary national standards resource, providing access to MSFC Optical Core Competencies for manufacturers and researchers. Plans are presented for the development of a national lending library of precision optical standards with emphasis on cost avoidance while improving measurement assurance.

World wide matching of registration metrology tools of various generations

NASA Astrophysics Data System (ADS)

Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

2008-10-01

Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

An image-processing software package: UU and Fig for optical metrology applications

NASA Astrophysics Data System (ADS)

Chen, Lujie

2013-06-01

Modern optical metrology applications are largely supported by computational methods, such as phase shifting [1], Fourier Transform [2], digital image correlation [3], camera calibration [4], etc, in which image processing is a critical and indispensable component. While it is not too difficult to obtain a wide variety of image-processing programs from the internet; few are catered for the relatively special area of optical metrology. This paper introduces an image-processing software package: UU (data processing) and Fig (data rendering) that incorporates many useful functions to process optical metrological data. The cross-platform programs UU and Fig are developed based on wxWidgets. At the time of writing, it has been tested on Windows, Linux and Mac OS. The userinterface is designed to offer precise control of the underline processing procedures in a scientific manner. The data input/output mechanism is designed to accommodate diverse file formats and to facilitate the interaction with other independent programs. In terms of robustness, although the software was initially developed for personal use, it is comparably stable and accurate to most of the commercial software of similar nature. In addition to functions for optical metrology, the software package has a rich collection of useful tools in the following areas: real-time image streaming from USB and GigE cameras, computational geometry, computer vision, fitting of data, 3D image processing, vector image processing, precision device control (rotary stage, PZT stage, etc), point cloud to surface reconstruction, volume rendering, batch processing, etc. The software package is currently used in a number of universities for teaching and research.

Final report on AFRIMETS.QM-K27: Determination of ethanol in aqueous matrix

NASA Astrophysics Data System (ADS)

Archer, Marcellé; Fernandes-Whaley, Maria; Visser, Ria; de Vos, Jayne; Prins, Sara; Rosso, Adriana; Ruiz de Arechavaleta, Mariana; Tahoun, Ibrahim; Kakoulides, Elias; Luvonga, Caleb; Muriira, Geoffrey; Naujalis, Evaldas; Zakaria, Osman Bin; Buzoianu, Mirella; Bebic, Jelena; Achour Mounir, Ben; Thanh, Ngo Huy

2013-01-01

From within AFRIMETS, the Regional Metrology Organization (RMO) for Africa, the RMO Key Comparison AFRIMETS.QM-K27 was coordinated by the National Metrology Institute of South Africa (NMISA) in 2011. Ten Metrology Institutes participated, comprising three AFRIMETS, two APMP, four EURAMET and one SIM participant. Participants were required to determine the forensic level concentration of two aqueous ethanol solutions that were gravimetrically prepared by the NMISA. Concentrations were expected to lie in the range of 0.1 mg/g to 5.0 mg/g. The accurate determination of ethanol content in aqueous medium is critical for regulatory forensic and trade purposes. The CCQM Organic Analysis Working Group has carried out several key comparisons (CCQM-K27 series) on the determination of ethanol in wine and aqueous matrices. Developing NMIs now had the opportunity to link to the earlier CCQM-K27 studies through the AFRIMETS.QM-K27 study. Gas chromatography coupled to flame ionisation or mass spectrometric detection was applied by eight of the participants, while three participants (including NMISA) applied titrimetry for the ethanol assay. The assigned reference value of the aqueous ethanol solutions was used to link AFRIMETS.QM-K27 to the CCQM-K27 key comparison reference value. The assigned reference values for AFRIMETS.QM-K27 Level 1 and Level 2 were (0.3249 ± 0.0021) mg/g (k = 2) and (4.6649 ± 0.0152) mg/g (k = 2), respectively. The reference values were determined using the purity-corrected gravimetric preparation values, while the standard uncertainty incorporated the gravimetric preparation and titrimetric homogeneity uncertainties. From previous CCQM-K27 studies, the expected spread (%CV) of higher order measurements of ethanol in aqueous medium is about 0.85% relative. In this study the CV for Level 1 is about 12% (10% with two outliers removed) and for Level 2 about 4%. Three of the ten laboratories submitted results within 1.5% of the gravimetric reference value for Level 1; four of the ten participating laboratories submitted mean results within 1.5% of the gravimetric reference value for Level 2. Two of the participating laboratories achieved mean results within 1.5% of the gravimetric reference value for both levels. Participants in the AFRIMETS-K27 study would therefore have benefited from a pilot study in which to test their measurement capability prior to participation in the key comparison. Several NMIs, however, will still be able to make new CMC claims based on their performance in this comparison. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology for decommissioning nuclear facilities: Partial outcomes of joint research project within the European Metrology Research Program.

PubMed

Suran, Jiri; Kovar, Petr; Smoldasova, Jana; Solc, Jaroslav; Van Ammel, Raf; Garcia Miranda, Maria; Russell, Ben; Arnold, Dirk; Zapata-García, Daniel; Boden, Sven; Rogiers, Bart; Sand, Johan; Peräjärvi, Kari; Holm, Philip; Hay, Bruno; Failleau, Guillaume; Plumeri, Stephane; Laurent Beck, Yves; Grisa, Tomas

2018-04-01

Decommissioning of nuclear facilities incurs high costs regarding the accurate characterisation and correct disposal of the decommissioned materials. Therefore, there is a need for the implementation of new and traceable measurement technologies to select the appropriate release or disposal route of radioactive wastes. This paper addresses some of the innovative outcomes of the project "Metrology for Decommissioning Nuclear Facilities" related to mapping of contamination inside nuclear facilities, waste clearance measurement, Raman distributed temperature sensing for long term repository integrity monitoring and validation of radiochemical procedures. Copyright © 2017 Elsevier Ltd. All rights reserved.

APMP.QM-S8: determination of mass fraction of benzoic acid, methyl paraben and n-butyl paraben in soy sauce

NASA Astrophysics Data System (ADS)

Teo, Tang Lin; Gui, Ee Mei; Lu, Ting; Sze Cheow, Pui; Giannikopoulou, Panagiota; Kakoulides, Elias; Lampi, Evgenia; Choi, Sik-man; Yip, Yiu-chung; Chan, Pui-kwan; Hui, Sin-kam; Wollinger, Wagner; Carvalho, Lucas J.; Garrido, Bruno C.; Rego, Eliane C. P.; Ahn, Seonghee; Kim, Byungjoo; Li, Xiuqin; Guo, Zhen; Styarini, Dyah; Aristiawan, Yosi; Putri Ramadhaningtyas, Dillani; Aryana, Nurhani; Ebarvia, Benilda S.; Dacuaya, Aaron; Tongson, Alleni; Aganda, Kim Christopher; Junvee Fortune, Thippaya; Tangtrirat, Pradthana; Mungmeechai, Thanarak; Ceyhan Gören, Ahmet; Gündüz, Simay; Yilmaz, Hasibe

2017-01-01

The supplementary comparison APMP.QM-S8: determination of mass fraction of benzoic acid, methyl paraben and n-butyl paraben in soy sauce was coordinated by the Health Sciences Authority, Singapore under the auspices of the Organic Analysis Working Group (OAWG) of the Comité Consultatif pour la Quantité de Matière (CCQM). Ten national metrology institutes (NMIs) or designated institutes (DIs) participated in the comparison. All the institutes participated in the comparison for benzoic acid, while six NMIs/DIs participated in the comparison for methyl paraben and n-butyl paraben. The comparison was designed to enable participating institutes to demonstrate their measurement capabilities in the determination of common preservatives in soy sauce, using procedure(s) that required simple sample preparation and selective detection in the mass fraction range of 50 to 1000 mg/kg. The demonstrated capabilities can be extended to include other polar food preservatives (e.g. sorbic acid, propionic acid and other alkyl benzoates) in water, aqueous-based beverages (e.g. fruit juices, tea extracts, sodas, sports drinks, etc) and aqueous-based condiments (e.g. vinegar, fish sauce, etc). Liquid--liquid extraction and/or dilution were applied, followed by instrumental analyses using LC-MS/MS, LC-MS, GC-MS (with or without derivatisation) or HPLC-DAD. Isotope dilution mass spectrometry was used for quantification, except in the case of a participating institute, where external calibration method was used for quantification of all three measurands. The assigned Supplementary Comparison Reference Values (SCRVs) were the medians of ten results for benzoic acid, six results for methyl paraben and six results for n-butyl paraben. Benzoic acid was assigned a SCRV of 154.55 mg/kg with a combined standard uncertainty of 0.94 mg/kg, methyl paraben was assigned a SCRV of 100.95 mg/kg with a combined standard uncertainty of 0.40 mg/kg, and n-butyl paraben was assigned a SCRV of 99.05 mg/kg with a combined standard uncertainty of 1.36 mg/kg. The k-factors for the estimation of the expanded uncertainties of the SCRVs were 2.26, 2.57 and 2.57, respectively. The degree of equivalence (with the SCRV) and its uncertainty were calculated for each result. All the participating institutes (except in one case for benzoic acid) were able to demonstrate or confirm their capabilities in the determination of polar food preservatives in water or aqueous-based beverages/condiments. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Postnatal craniofacial skeleton development following a pushback operation of patients with cleft palate.

PubMed

Viteporn, S; Enemark, H; Melsen, B

1991-10-01

A longitudinal growth study of the craniofacial skeleton in 52 (19 males, 33 females) Danish individuals with cleft palates was performed. Thirty (13 males, 17 females) had clefts of the soft palate only or clefts extending into the posterior third of the hard palate. Twenty-two (6 males, 16 females) had more extensive clefts including up to two-thirds of the hard palate. The cleft was closed with a pushback operation at 22 months of age. Orthodontic treatment was included in the early mixed dentition. Lateral cephalometries were obtained at 5, 8, 12, 16, and 21 years of age. Twenty-four variables were digitized and analyzed. The results indicated that patients with more extensive clefts demonstrated significantly smaller anterior cranial base length (N-S), total cranial base length (N-Ba), maxillary dentoalveolar base length (A-PMP), mandibular length (Cd-Pgn), upper anterior and posterior facial heights (N-ANS and P-PMP), and total facial height (N-Gn). Patients with the more extensive clefts reached maximum growth spurt later than patients with less extensive clefts in all dimensions except the A-PMP and the lower and total facial heights.

Final report on APMP.M.H-S3: Comparison on hardness measurement Rockwell scale A and B

NASA Astrophysics Data System (ADS)

Sanponpute, Tassanai; Meesaplak, Apichaya; Menelao, Febo; Chan, T. K.; Bahng, Gun-Woong; Titus, S. S. K.; Jain, S. K.

2012-01-01

The APMP.M.H-S3 Rockwell hardness intercomparison was initiated by NIMT, Thailand and the required protocol was prepared by NIMT and checked by Dr John Man, MNIA, Australia, in 2009. PTB, Germany, Standards and Calibration Laboratory (SCL), Hong Kong, National Physical Laboratory (NPLI), India, and Korea Research Institute of Standards and Science (KRISS), Korea, participated in this comparison. This comparison exercise was focused on the measurement range of 25 to 100 HRBW scale and 35 to 85 HRA scale. The round robin test was done during the period from April 2010 to October 2010. The participating laboratories have demonstrated the capability of the machine and the operating conditions according to ISO 6508 Part 3 to perform the measurements. However, SCL, Hong Kong, could demonstrate their capability to perform the measurements only according to ISO 6508 Part 2. The CMCs declared by the different laboratories lie in the range of 0.30 HRA to 0.40 HRA and 0.40 HRBW to 0.75 HRBW. The CMC declared by SCL for the Rockwell B scale is 1.5 HRBW for the reason described above. It is observed from the results that the measurement uncertainty is estimated not less than the CMCs declared by the laboratories. From the measurement results provided by all the participating laboratories, the En ratio was determined to establish the degrees of equivalence. The En ratio was calculated by including as well as by excluding the results of the laboratory which has performed the test according to ISO 6508 Part 2 in order to make sure that it does not affect the overall results. It is noticed that the En ratio was still found to remain less than 1. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the APMP, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Improvement of the software Bernese for SLR data processing in the Main Metrological Centre of the State Time and Frequency Service

NASA Astrophysics Data System (ADS)

Tsyba, E.; Kaufman, M.

2015-08-01

Preparatory works for resuming operational calculations of the Earth rotation parameters based on the results of satellite laser ranging data processing (LAGEOS 1, LAGEOS 2) are to be completed in the Main Metrology Centre Of The State Time And Frequency Service (VNIIFTRI) in 2014. For this purpose BERNESE 5.2 software (Dach & Walser, 2014) was chosen as a base software which has been used for many years in the Main Metrological Centre of the State Time and Frequency Service to process phase observations of GLONASS and GPS satellites. Although in the BERNESE 5.2 software announced presentation the possibility of the SLR data processing is declared, it has not been fully implemented. In particular there is no such an essential element as corrective action (as input or resulting parameters) in the local time scale ("time bias"), etc. Therefore, additional program blocks have been developed and integrated into the BERNESE 5.2 software environment. The program blocks are written in Perl and Matlab program languages and can be used both for Windows and Linux, 32-bit and 64-bit platforms.

Final report on APMP.RF-S21.F

NASA Astrophysics Data System (ADS)

Ishii, Masanori; Kim, Jeong Hwan; Ji, Yu; Cho, Chi Hyun; Zhang, Tim

2018-01-01

The supplementary comparison report APMP.RF-S21.F describes the comparison of loop antennas, which was conducted between April 2013 and January 2014. The two comparison artefacts were well-characterised active loop antennas of diameter 30 cm and 60 cm respectively, which typically operate in a frequency range from 9 kHz to 30 MHz. These antennas represent the main groups of antennas which are used around the world for EMC measurements in the frequency range below 30 MHz. There are several well-known methods for calibrating the antenna factor of these devices. The calibration systems used in this comparison for the loop antennas employed the standard magnetic field method or the three-antenna method. Despite the limitations of the algorithm, which we used to derive the reference value for each case (particularly for small samples), the actual calculated reference values seem to be reasonable. As a result, the agreement between each participant was very good in all cases. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCEM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology: Calibration and measurement processes guidelines

NASA Technical Reports Server (NTRS)

Castrup, Howard T.; Eicke, Woodward G.; Hayes, Jerry L.; Mark, Alexander; Martin, Robert E.; Taylor, James L.

1994-01-01

The guide is intended as a resource to aid engineers and systems contracts in the design, implementation, and operation of metrology, calibration, and measurement systems, and to assist NASA personnel in the uniform evaluation of such systems supplied or operated by contractors. Methodologies and techniques acceptable in fulfilling metrology quality requirements for NASA programs are outlined. The measurement process is covered from a high level through more detailed discussions of key elements within the process, Emphasis is given to the flowdown of project requirements to measurement system requirements, then through the activities that will provide measurements with defined quality. In addition, innovations and techniques for error analysis, development of statistical measurement process control, optimization of calibration recall systems, and evaluation of measurement uncertainty are presented.

Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Pratt, Jon R.; Kramar, John A.; Newell, David B.; Smith, Douglas T.

2005-05-01

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughput, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM-based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International System of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Radius of Curvature Measurements: An Independent Look at Accuracy Using Novel Optical Metrology

NASA Technical Reports Server (NTRS)

Taylor, Bryon; Kahan, Mark; Russell, Kevin (Technical Monitor)

2002-01-01

The AMSD (Advanced Mirror System Demonstrator) program mirror specifications include the ability to manufacture the mirror to a radius of curvature of 10 m +/- 1 mm and to control its radius at 30K to the same specification. Therefore, it is necessary for the Government Team to be able to measure mirror radius of curvature to an accuracy of better than 0.5 mm. This presentation discusses a novel optical metrology system for measuring radius of curvature.

GPU accelerated Monte-Carlo simulation of SEM images for metrology

NASA Astrophysics Data System (ADS)

Verduin, T.; Lokhorst, S. R.; Hagen, C. W.

2016-03-01

In this work we address the computation times of numerical studies in dimensional metrology. In particular, full Monte-Carlo simulation programs for scanning electron microscopy (SEM) image acquisition are known to be notoriously slow. Our quest in reducing the computation time of SEM image simulation has led us to investigate the use of graphics processing units (GPUs) for metrology. We have succeeded in creating a full Monte-Carlo simulation program for SEM images, which runs entirely on a GPU. The physical scattering models of this GPU simulator are identical to a previous CPU-based simulator, which includes the dielectric function model for inelastic scattering and also refinements for low-voltage SEM applications. As a case study for the performance, we considered the simulated exposure of a complex feature: an isolated silicon line with rough sidewalls located on a at silicon substrate. The surface of the rough feature is decomposed into 408 012 triangles. We have used an exposure dose of 6 mC/cm2, which corresponds to 6 553 600 primary electrons on average (Poisson distributed). We repeat the simulation for various primary electron energies, 300 eV, 500 eV, 800 eV, 1 keV, 3 keV and 5 keV. At first we run the simulation on a GeForce GTX480 from NVIDIA. The very same simulation is duplicated on our CPU-based program, for which we have used an Intel Xeon X5650. Apart from statistics in the simulation, no difference is found between the CPU and GPU simulated results. The GTX480 generates the images (depending on the primary electron energy) 350 to 425 times faster than a single threaded Intel X5650 CPU. Although this is a tremendous speedup, we actually have not reached the maximum throughput because of the limited amount of available memory on the GTX480. Nevertheless, the speedup enables the fast acquisition of simulated SEM images for metrology. We now have the potential to investigate case studies in CD-SEM metrology, which otherwise would take unreasonable amounts of computation time.

Final report on APMP.M.M.K4.1—bilateral comparison of 1 kg stainless steel mass standards between KRISS and A*STAR

NASA Astrophysics Data System (ADS)

Chung, J. W.; Lee, S. M.; Lee, S. J.

2017-01-01

This report describes a bilateral comparison of 1 kg stainless steel mass standard between the Korea Research Institute of Standards and Science (KRISS), and the National Measurement Centre, Agency for Science, Technology and Research (A*STAR), Singapore, which is registered in the BIPM KCDB as APMP.M.M-K4.1. This nominal value was chosen as it followed the nominal value of CCM.M-K4. This bilateral comparison was piloted by KRISS. The transfer weight was delivered to A*STAR from KRISS in April 2015 and received back from A*STAR in October 2015. A*STAR are aiming to improve their calibration measurement capability (CMC) for mass of 1 kg. KRISS participated in both this comparison and CCM.M-K4, providing a link between the A*STAR result and the KCRV of CCM.M-K4. The final report of this comparison is given in this document. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

The UK National Quantum Technologies Hub in sensors and metrology (Keynote Paper)

NASA Astrophysics Data System (ADS)

Bongs, K.; Boyer, V.; Cruise, M. A.; Freise, A.; Holynski, M.; Hughes, J.; Kaushik, A.; Lien, Y.-H.; Niggebaum, A.; Perea-Ortiz, M.; Petrov, P.; Plant, S.; Singh, Y.; Stabrawa, A.; Paul, D. J.; Sorel, M.; Cumming, D. R. S.; Marsh, J. H.; Bowtell, R. W.; Bason, M. G.; Beardsley, R. P.; Campion, R. P.; Brookes, M. J.; Fernholz, T.; Fromhold, T. M.; Hackermuller, L.; Krüger, P.; Li, X.; Maclean, J. O.; Mellor, C. J.; Novikov, S. V.; Orucevic, F.; Rushforth, A. W.; Welch, N.; Benson, T. M.; Wildman, R. D.; Freegarde, T.; Himsworth, M.; Ruostekoski, J.; Smith, P.; Tropper, A.; Griffin, P. F.; Arnold, A. S.; Riis, E.; Hastie, J. E.; Paboeuf, D.; Parrotta, D. C.; Garraway, B. M.; Pasquazi, A.; Peccianti, M.; Hensinger, W.; Potter, E.; Nizamani, A. H.; Bostock, H.; Rodriguez Blanco, A.; Sinuco-Leon, G.; Hill, I. R.; Williams, R. A.; Gill, P.; Hempler, N.; Malcolm, G. P. A.; Cross, T.; Kock, B. O.; Maddox, S.; John, P.

2016-04-01

The UK National Quantum Technology Hub in Sensors and Metrology is one of four flagship initiatives in the UK National of Quantum Technology Program. As part of a 20-year vision it translates laboratory demonstrations to deployable practical devices, with game-changing miniaturized components and prototypes that transform the state-of-the-art for quantum sensors and metrology. It brings together experts from the Universities of Birmingham, Glasgow, Nottingham, Southampton, Strathclyde and Sussex, NPL and currently links to over 15 leading international academic institutions and over 70 companies to build the supply chains and routes to market needed to bring 10-1000x improvements in sensing applications. It seeks, and is open to, additional partners for new application development and creates a point of easy open access to the facilities and supply chains that it stimulates or nurtures.

Photomask applications of traceable atomic force microscope dimensional metrology at NIST

NASA Astrophysics Data System (ADS)

Dixson, Ronald; Orji, Ndubuisi G.; Potzick, James; Fu, Joseph; Allen, Richard A.; Cresswell, Michael; Smith, Stewart; Walton, Anthony J.; Tsiamis, Andreas

2007-10-01

The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. Three major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C-AFM), the second is the first generation of commercially available critical dimension AFM (CD-AFM), and the third is a current generation CD-AFM at SEMATECH - for which NIST has established the calibration and uncertainties. All of these instruments have useful applications in photomask metrology. Linewidth reference metrology is an important application of CD-AFM. We have performed a preliminary comparison of linewidths measured by CD-AFM and by electrical resistance metrology on a binary mask. For the ten selected test structures with on-mask linewidths between 350 nm and 600 nm, most of the observed differences were less than 5 nm, and all of them were less than 10 nm. The offsets were often within the estimated uncertainties of the AFM measurements, without accounting for the effect of linewidth roughness or the uncertainties of electrical measurements. The most recent release of the NIST photomask standard - which is Standard Reference Material (SRM) 2059 - was also supported by CD-AFM reference measurements. We review the recent advances in AFM linewidth metrology that will reduce the uncertainty of AFM measurements on this and future generations of the NIST photomask standard. The NIST C-AFM has displacement metrology for all three axes traceable to the 633 nm wavelength of the iodine-stabilized He-Ne laser. One of the important applications of the C-AFM is step height metrology, which has some relevance to phase shift calibration. In the current generation of the system, the approximate level of relative standard uncertainty for step height measurements at the 100 nm scale is 0.1 %. We discuss the monitor history of a 290 nm step height, originally measured on the C-AFM with a 1.9 nm (k = 2) expanded uncertainty, and describe advances that bring the step height uncertainty of recent measurements to an estimated 0.6 nm (k = 2). Based on this work, we expect to be able to reduce the topographic component of phase uncertainty in alternating aperture phase shift masks (AAPSM) by a factor of three compared to current calibrations based on earlier generation step height references.

The elusive Heisenberg limit in quantum-enhanced metrology

PubMed Central

Demkowicz-Dobrzański, Rafał; Kołodyński, Jan; Guţă, Mădălin

2012-01-01

Quantum precision enhancement is of fundamental importance for the development of advanced metrological optical experiments, such as gravitational wave detection and frequency calibration with atomic clocks. Precision in these experiments is strongly limited by the 1/√N shot noise factor with N being the number of probes (photons, atoms) employed in the experiment. Quantum theory provides tools to overcome the bound by using entangled probes. In an idealized scenario this gives rise to the Heisenberg scaling of precision 1/N. Here we show that when decoherence is taken into account, the maximal possible quantum enhancement in the asymptotic limit of infinite N amounts generically to a constant factor rather than quadratic improvement. We provide efficient and intuitive tools for deriving the bounds based on the geometry of quantum channels and semi-definite programming. We apply these tools to derive bounds for models of decoherence relevant for metrological applications including: depolarization, dephasing, spontaneous emission and photon loss. PMID:22990859

Theory-based metrological traceability in education: A reading measurement network.

PubMed

Fisher, William P; Stenner, A Jackson

2016-10-01

Huge resources are invested in metrology and standards in the natural sciences, engineering, and across a wide range of commercial technologies. Significant positive returns of human, social, environmental, and economic value on these investments have been sustained for decades. Proven methods for calibrating test and survey instruments in linear units are readily available, as are data- and theory-based methods for equating those instruments to a shared unit. Using these methods, metrological traceability is obtained in a variety of commercially available elementary and secondary English and Spanish language reading education programs in the U.S., Canada, Mexico, and Australia. Given established historical patterns, widespread routine reproduction of predicted text-based and instructional effects expressed in a common language and shared frame of reference may lead to significant developments in theory and practice. Opportunities for systematic implementations of teacher-driven lean thinking and continuous quality improvement methods may be of particular interest and value.

Metrology: Measurement Assurance Program Guidelines

NASA Technical Reports Server (NTRS)

Eicke, W. G.; Riley, J. P.; Riley, K. J.

1995-01-01

The 5300.4 series of NASA Handbooks for Reliability and Quality Assurance Programs have provisions for the establishment and utilization of a documented metrology system to control measurement processes and to provide objective evidence of quality conformance. The intent of these provisions is to assure consistency and conformance to specifications and tolerances of equipment, systems, materials, and processes procured and/or used by NASA, its international partners, contractors, subcontractors, and suppliers. This Measurement Assurance Program (MAP) guideline has the specific objectives to: (1) ensure the quality of measurements made within NASA programs; (2) establish realistic measurement process uncertainties; (3) maintain continuous control over the measurement processes; and (4) ensure measurement compatibility among NASA facilities. The publication addresses MAP methods as applied within and among NASA installations and serves as a guide to: control measurement processes at the local level (one facility); conduct measurement assurance programs in which a number of field installations are joint participants; and conduct measurement integrity (round robin) experiments in which a number of field installations participate to assess the overall quality of particular measurement processes at a point in time.

Programmed LWR metrology by multi-techniques approach

NASA Astrophysics Data System (ADS)

Reche, Jérôme; Besacier, Maxime; Gergaud, Patrice; Blancquaert, Yoann; Freychet, Guillaume; Labbaye, Thibault

2018-03-01

Nowadays, roughness control presents a huge challenge for the lithography step. For advanced nodes, this morphological aspect reaches the same order of magnitude than the Critical Dimension. Hence, the control of roughness needs an adapted metrology. In this study, specific samples with designed roughness have been manufactured using e-beam lithography. These samples have been characterized with three different methodologies: CD-SEM, OCD and SAXS. The main goal of the project is to compare the capability of each of these techniques in terms of reliability, type of information obtained, time to obtain the measurements and level of maturity for the industry.

Fabrication of the Advanced X-ray Astrophysics Facility (AXAF) Optics: A Deterministic, Precision Engineering Approach to Optical Fabrication

NASA Technical Reports Server (NTRS)

Gordon, T. E.

1995-01-01

The mirror assembly of the AXAF observatory consists of four concentric, confocal, Wolter type 1 telescopes. Each telescope includes two conical grazing incidence mirrors, a paraboloid followed by a hyperboloid. Fabrication of these state-or-the-art optics is now complete, with predicted performance that surpasses the goals of the program. The fabrication of these optics, whose size and requirements exceed those of any previous x-ray mirrors, presented a challenging task requiring the use of precision engineering in many different forms. Virtually all of the equipment used for this effort required precision engineering. Accurate metrology required deterministic support of the mirrors in order to model the gravity distortions which will not be present on orbit. The primary axial instrument, known as the Precision Metrology Station (PMS), was a unique scanning Fizeau interferometer. After metrology was complete, the optics were placed in specially designed Glass Support Fixtures (GSF's) for installation on the Automated Cylindrical Grinder/Polishers (ACG/P's). The GSF's were custom molded for each mirror element to match the shape of the outer surface to minimize distortions of the inner surface. The final performance of the telescope is expected to far exceed the original goals and expectations of the program.

Final report of APMP.QM-K46 ammonia in nitrogen at 30 μmol/mol level

NASA Astrophysics Data System (ADS)

Uehara, Shinji; Qiao, Han; Shimosaka, Takuya

2017-01-01

This report describes the results for a bilateral comparison of ammonia in nitrogen gas mixture. The nominal amount-of-substance fraction was 30 μmol/mol. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Comparison APMP.QM-S2.1: oxygen in nitrogen at atmospheric level

NASA Astrophysics Data System (ADS)

Kim, B. M.; Kim, K.; Jung, J.; Oh, S.; Hui, L.; Li, H.; Keat, T. B.; Ann, C. H.

2016-01-01

This document describes results of the bilateral comparison of an oxygen in nitrogen gas mixture. The nominal amount-of-substance fraction was 0.2 mol/mol oxygen in nitrogen Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

PREFACE: VII Brazilian Congress on Metrology (Metrologia 2013)

NASA Astrophysics Data System (ADS)

Costa-Félix, Rodrigo; Bernardes, Americo; Valente de Oliveira, José Carlos; Mauro Granjeiro, José; Epsztejn, Ruth; Ihlenfeld, Waldemar; Smarçaro da Cunha, Valnei

2015-01-01

SEVENTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2013) Metrology and Quality for a Sustainable Development From November 24th to 27th 2013 was issued the Seventh Brazilian Congress on Metrology (Metrologia 2013), which is a biannual conference organized and sponsored by the Brazilian Society of Metrology (SBM) and the Brazilian National Institute of Metrology, Quality and Technology (Inmetro). This edition was held in the charming and historical city of Ouro Preto, MG, Brazil, and aimed to join people and institutions devoted to the dissemination of the metrology and conformity assessment. The Metrologia 2013 Conference consisted of Keynote Speeches (7) and regular papers (204). Among the regular papers, the 47 most outstanding ones, comprising a high quality content on Metrology and Conformity Assessment, were selected to be published in this issue of the Journal of Physics: Conference Series. The topics of the conference covered all important areas of Metrology, which were agglutinated in the following sessions in the present issue: . Physical Metrology (Acoustics, Vibration and Ultrasound; Electricity and Magnetism; Mechanics; Optics); . Metrology on Ionizing Radiations; . Time and Frequency; . Chemistry Metrology; . Materials Metrology; . Biotechnology; . Uncertainty, Statistics and Mathematics; . Legal Metrology; . Conformity Assessment. It is our great pleasure to present this volume of IOP Journal of Physics: Conference Series (JPCS) to the scientific community to promote further research in Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by Metrologia 2013. President of the congress Americo Bernardes Federal University of Ouro Preto atb@iceb.ufop.br Editor-in-chief Rodrigo Costa-Félix Brazilian National Institute of Metrology, Quality and Technology rpfelix@inmetro.gov.br Editors José Carlos Valente de Oliveira (Editor on Mechanical Metrology) Brazilian National Institute of Metrology, Quality and Technology jcoliveira@inmetro.gov.br José Mauro Granjeiro (Editor on Biotechnology) Brazilian National Institute of Metrology, Quality and Technology jmgranjeiro@inmetro.gov.br Ruth Epsztejn (Editor on Conformity Assessment) Brazilian National Institute of Metrology, Quality and Technology repsztejn@inmetro.gov.br Waldemar Ihlenfeld (Editor on Electrical Metrology) Brazilian National Institute of Metrology, Quality and Technology wgihlenfeld-pronametro@inmetro.gov.br Valnei Smarçaro da Cunha (Editor on Chemistry Metrology) Brazilian National Institute of Metrology, Quality and Technology vscunha@inmetro.gov.br Technical and Scientific Committee for Metrologia 2013 Ado Jório (UFMG) Carlos Achete (UFRJ, Inmetro) Flávio Vasconcelos (UFMG) Giorgio Moscati (USP) Hans Peter Grieneisen (Inmetro) Humberto Brandi (Inmetro) José Carlos Valente de Oliveira (Inmetro) José Guilherme Pereira Peixoto (IRD) José Mauro Granjeiro (Inmetro) Luiz Claudio Moreira Paschoal (Petrobras) Luis Fernado Rust (Inmetro) Luiz Silva Mello (PUC RJ) Marcos Nogueira Eberlin (Unicamp) Oleksii Kuznetsov (Inmetro) Regis Landim (Inmetro) Ricardo Carvalho (ON) Rodrigo Costa-Felix (Inmetro) Romeu José Daroda (Inmetro) Ruth Epsztejn (Inmetro) Valnei Smarçaro da Cunha (Inmetro) Valter Aibe (Inmetro) Waldemar Guilherme Kürten Ihlenfeld (PTB) Wanderley de Souza (UFRJ, Inmetro)

In-cell overlay metrology by using optical metrology tool

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Park, Hyowon; Liang, Waley; Choi, DongSub; Kim, Nakyoon; Lee, Jeongpyo; Pandev, Stilian; Jeon, Sanghuck; Robinson, John C.

2018-03-01

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after litho control loop typically involves high frequency sampling: every lot or nearly every lot. An after etch overlay metrology step is often included, at a lower sampling frequency, in order to characterize and compensate for bias. The after etch metrology step often involves CD-SEM metrology, in this case in-cell and ondevice. This work explores an alternative approach using spectroscopic ellipsometry (SE) metrology and a machine learning analysis technique. Advanced 1x nm DRAM wafers were prepared, including both nominal (POR) wafers with mean overlay offsets, as well as DOE wafers with intentional across wafer overlay modulation. After litho metrology was measured using optical imaging metrology, as well as after etch metrology using both SE and CD-SEM for comparison. We investigate 2 types of machine learning techniques with SE data: model-less and model-based, showing excellent performance for after etch in-cell on-device overlay metrology.

MetroBeta: Beta Spectrometry with Metallic Magnetic Calorimeters in the Framework of the European Program of Ionizing Radiation Metrology

NASA Astrophysics Data System (ADS)

Loidl, M.; Beyer, J.; Bockhorn, L.; Enss, C.; Györi, D.; Kempf, S.; Kossert, K.; Mariam, R.; Nähle, O.; Paulsen, M.; Rodrigues, M.; Schmidt, M.

2018-05-01

MetroBeta is a European project aiming at the improvement of the knowledge of the shapes of beta spectra, both in terms of theoretical calculations and measurements. It is part of a common European program of ionizing radiation metrology. Metallic magnetic calorimeters (MMCs) with the beta emitter embedded in the absorber have in the past proven to be among the best beta spectrometers, in particular for low-energy beta transitions. Within this project, new designs of MMCs optimized for five different beta energy ranges were developed. A new detector module with thermal decoupling of MMC and SQUID chips was designed. An important aspect of the research and development concerns the source/absorber preparation techniques. Four beta spectra with maximum energies ranging from 76 to 709 keV will be measured. Improved theoretical calculation methods and complementary measurement techniques complete the project.

Method and system for processing optical elements using magnetorheological finishing

DOEpatents

Menapace, Joseph Arthur; Schaffers, Kathleen Irene; Bayramian, Andrew James; Molander, William A

2012-09-18

A method of finishing an optical element includes mounting the optical element in an optical mount having a plurality of fiducials overlapping with the optical element and obtaining a first metrology map for the optical element and the plurality of fiducials. The method also includes obtaining a second metrology map for the optical element without the plurality of fiducials, forming a difference map between the first metrology map and the second metrology map, and aligning the first metrology map and the second metrology map. The method further includes placing mathematical fiducials onto the second metrology map using the difference map to form a third metrology map and associating the third metrology map to the optical element. Moreover, the method includes mounting the optical element in the fixture in an MRF tool, positioning the optical element in the fixture; removing the plurality of fiducials, and finishing the optical element.

Does increased postural threat lead to more conscious control of posture?

PubMed

Huffman, J L; Horslen, B C; Carpenter, M G; Adkin, A L

2009-11-01

Although it is well established that postural threat modifies postural control, little is known regarding the underlying mechanism(s) responsible for these changes. It is possible that changes in postural control under conditions of elevated postural threat result from a shift to a more conscious control of posture. The purpose of this study was to determine the influence of elevated postural threat on conscious control of posture and to determine the relationship between conscious control and postural control measures. Forty-eight healthy young adults stood on a force plate at two different surface heights: ground level (LOW) and 3.2-m above ground level (HIGH). Centre of pressure measures calculated in the anterior-posterior (AP) direction were mean position (AP-MP), root mean square (AP-RMS) and mean power frequency (AP-MPF). A modified state-specific version of the Movement Specific Reinvestment Scale was used to measure conscious motor processing (CMP) and movement self-consciousness (MSC). Balance confidence, fear of falling, perceived stability, and perceived and actual anxiety indicators were also collected. A significant effect of postural threat was found for movement reinvestment as participants reported more conscious control and a greater concern about their posture at the HIGH height. Significant correlations between CMP and MSC with AP-MP were observed as participants who consciously controlled and were more concerned for their posture leaned further away from the platform edge. It is possible that changes in movement reinvestment can influence specific aspects of posture (leaning) but other aspects may be immune to these changes (amplitude and frequency).

Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

NASA Astrophysics Data System (ADS)

Kim, Hyun-Sok; Hyun, Min-Sung; Ju, Jae-Wuk; Kim, Young-Sik; Lambregts, Cees; van Rhee, Peter; Kim, Johan; McNamara, Elliott; Tel, Wim; Böcker, Paul; Oh, Nang-Lyeom; Lee, Jun-Hyung

2018-03-01

Computational metrology has been proposed as the way forward to resolve the need for increased metrology density, resulting from extending correction capabilities, without adding actual metrology budget. By exploiting TWINSCAN based metrology information, dense overlay fingerprints for every wafer can be computed. This extended metrology dataset enables new use cases, such as monitoring and control based on fingerprints for every wafer of the lot. This paper gives a detailed description, discusses the accuracy of the fingerprints computed, and will show results obtained in a DRAM HVM manufacturing environment. Also an outlook for improvements and extensions will be shared.

Investigations into mirror fabrication metrology analysis

NASA Technical Reports Server (NTRS)

Dimmock, John O.

1994-01-01

This final report describes the work performed under this delivery order from June 1993 through August 1994. The scope of work included three distinct tasks in support of the AXAF-I program. The objective of the first task was to perform investigations of the grinding and polishing characteristics of the zerodur material by fabricating several samples. The second task was to continue the development of the integrated optical performance modeling software for AXAF-I. The purpose of third and final task was to develop and update the database of AXAF technical documents for an easy and rapid access. The MSFC optical and metrology shops were relocated from the B-wing of Building 4487 to Room BC 144 of Building 4466 in the beginning of this contract. This included dismantling, packing, and moving the equipment from its old location, and then reassembling it at the new location. A total of 65 zerodur samples, measuring 1 inch x 2 inches x 6 inches were ground and polished to a surface figure of lambda/10 p-v, and a surface finish of 5A rms were fabricated for coating tests. A number of special purpose tools and metal mirrors were also fabricated to support various AXAF-I development activities. In the metrology area, the ZYGO Mark 4 interferometer was relocated and also upgraded with a faster and more powerful processor. Surface metrology work was also performed on the coating samples and other optics using ZYGO interferometer and WYKO profilometer. A number of new features have been added to the GRAZTRACE program to enhance its analysis and modeling capabilities. A number of new commands have been added to the command mode GRAZTRACE program to provide a better control to the user on the program execution and data manipulation. Some commands and parameter entries have been reorganized for a uniform format. The command mode version of the convolution program CONVOLVE has been developed. An on-line help system and a user's manual have also been developed for the benefit of the users. The database of AXAF technical documents continues to progress. The titles, company name, date, and location of over 390 documents have been entered in this database. This database provides both a data search and retrieval function, and a data adding function. These functions allow a user to quickly search the data files for documents or add new information. A detailed user's guide has also been prepared. This user guide includes a document classification guide, a list of abbreviations, and a list of acronyms, which have been used in compiling this database of AXAF-I technical documents.

Large Volume, Optical and Opto-Mechanical Metrology Techniques for ISIM on JWST

NASA Technical Reports Server (NTRS)

Hadjimichael, Theo

2015-01-01

The final, flight build of the Integrated Science Instrument Module (ISIM) element of the James Webb Space Telescope is the culmination of years of work across many disciplines and partners. This paper covers the large volume, ambient, optical and opto-mechanical metrology techniques used to verify the mechanical integration of the flight instruments in ISIM, including optical pupil alignment. We present an overview of ISIM's integration and test program, which is in progress, with an emphasis on alignment and optical performance verification. This work is performed at NASA Goddard Space Flight Center, in close collaboration with the European Space Agency, the Canadian Space Agency, and the Mid-Infrared Instrument European Consortium.

Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time

NASA Astrophysics Data System (ADS)

Zhao, Qian; Wang, Lei; Wang, Jazer; Wang, ChangAn; Shi, Hong-Fei; Guerrero, James; Feng, Mu; Zhang, Qiang; Liang, Jiao; Guo, Yunbo; Zhang, Chen; Wallow, Tom; Rio, David; Wang, Lester; Wang, Alvin; Wang, Jen-Shiang; Gronlund, Keith; Lang, Jun; Koh, Kar Kit; Zhang, Dong Qing; Zhang, Hongxin; Krishnamurthy, Subramanian; Fei, Ray; Lin, Chiawen; Fang, Wei; Wang, Fei

2018-03-01

Classical SEM metrology, CD-SEM, uses low data rate and extensive frame-averaging technique to achieve high-quality SEM imaging for high-precision metrology. The drawbacks include prolonged data collection time and larger photoresist shrinkage due to excess electron dosage. This paper will introduce a novel e-beam metrology system based on a high data rate, large probe current, and ultra-low noise electron optics design. At the same level of metrology precision, this high speed e-beam metrology system could significantly shorten data collection time and reduce electron dosage. In this work, the data collection speed is higher than 7,000 images per hr. Moreover, a novel large field of view (LFOV) capability at high resolution was enabled by an advanced electron deflection system design. The area coverage by LFOV is >100x larger than classical SEM. Superior metrology precision throughout the whole image has been achieved, and high quality metrology data could be extracted from full field. This new capability on metrology will further improve metrology data collection speed to support the need for large volume of metrology data from OPC model calibration of next generation technology. The shrinking EPE (Edge Placement Error) budget places more stringent requirement on OPC model accuracy, which is increasingly limited by metrology errors. In the current practice of metrology data collection and data processing to model calibration flow, CD-SEM throughput becomes a bottleneck that limits the amount of metrology measurements available for OPC model calibration, impacting pattern coverage and model accuracy especially for 2D pattern prediction. To address the trade-off in metrology sampling and model accuracy constrained by the cycle time requirement, this paper employs the high speed e-beam metrology system and a new computational software solution to take full advantage of the large volume data and significantly reduce both systematic and random metrology errors. The new computational software enables users to generate large quantity of highly accurate EP (Edge Placement) gauges and significantly improve design pattern coverage with up to 5X gain in model prediction accuracy on complex 2D patterns. Overall, this work showed >2x improvement in OPC model accuracy at a faster model turn-around time.

Toward reliable and repeatable automated STEM-EDS metrology with high throughput

NASA Astrophysics Data System (ADS)

Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

2018-03-01

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Final report of international comparison APMP.QM-S2.2015 of oxygen in nitrogen at 0.2 mol/mol

NASA Astrophysics Data System (ADS)

Aoki, Nobuyuki; Shimosaka, Takuya; Lin, Tsai-Yin; Liu, Hsin-Wang; Huang, Chiung-Kun; Wongjuk, Arnuttachai; Rattanasombat, Soponrat; Sinweeruthai, Ratirat; Uehara, Shinji; Aleksandrov, Vladimir

2017-01-01

This document describes the results of the supplementary comparison for oxygen in nitrogen gas mixture. The nominal amount-of-substance fraction of oxygen is 0.20 mol/mol. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Efficient hybrid metrology for focus, CD, and overlay

NASA Astrophysics Data System (ADS)

Tel, W. T.; Segers, B.; Anunciado, R.; Zhang, Y.; Wong, P.; Hasan, T.; Prentice, C.

2017-03-01

In the advent of multiple patterning techniques in semiconductor industry, metrology has progressively become a burden. With multiple patterning techniques such as Litho-Etch-Litho-Etch and Sidewall Assisted Double Patterning, the number of processing step have increased significantly and therefore, so as the amount of metrology steps needed for both control and yield monitoring. The amount of metrology needed is increasing in each and every node as more layers needed multiple patterning steps, and more patterning steps per layer. In addition to this, there is that need for guided defect inspection, which in itself requires substantially denser focus, overlay, and CD metrology as before. Metrology efficiency will therefore be cruicial to the next semiconductor nodes. ASML's emulated wafer concept offers a highly efficient method for hybrid metrology for focus, CD, and overlay. In this concept metrology is combined with scanner's sensor data in order to predict the on-product performance. The principle underlying the method is to isolate and estimate individual root-causes which are then combined to compute the on-product performance. The goal is to use all the information available to avoid ever increasing amounts of metrology.

Optical metrology for Starlight Separated Spacecraft Stellar Interferometry Mission

NASA Technical Reports Server (NTRS)

Dubovitsky, S.; Lay, O. P.; Peters, R. D.; Abramovici, A.; Asbury, C. G.; Kuhnert, A. C.; Mulder, J. L.

2002-01-01

We describe a high-precision inter-spacecraft metrology system designed for NASA 's StarLight mission, a space-based separated-spacecraft stellar interferometer. It consists of dual-target linear metrology, based on a heterodyne interferometer with carrier phase modulation, and angular metrology designed to sense the pointing of the laser beam and provides bearing information. The dual-target operation enables one metrology beam to sense displacement of two targets independently. We present the current design, breadboard implementation of the Metrology Subsystem in a stellar interferometer testbed and the present state of development of flight qualifiable subsystem components.

7/5nm logic manufacturing capabilities and requirements of metrology

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

2018-03-01

This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

Double degree master program: Optical Design

NASA Astrophysics Data System (ADS)

Bakholdin, Alexey; Kujawinska, Malgorzata; Livshits, Irina; Styk, Adam; Voznesenskaya, Anna; Ezhova, Kseniia; Ermolayeva, Elena; Ivanova, Tatiana; Romanova, Galina; Tolstoba, Nadezhda

2015-10-01

Modern tendencies of higher education require development of master programs providing achievement of learning outcomes corresponding to quickly variable job market needs. ITMO University represented by Applied and Computer Optics Department and Optical Design and Testing Laboratory jointly with Warsaw University of Technology represented by the Institute of Micromechanics and Photonics at The Faculty of Mechatronics have developed a novel international master double-degree program "Optical Design" accumulating the expertise of both universities including experienced teaching staff, educational technologies, and experimental resources. The program presents studies targeting research and professional activities in high-tech fields connected with optical and optoelectronics devices, optical engineering, numerical methods and computer technologies. This master program deals with the design of optical systems of various types, assemblies and layouts using computer modeling means; investigation of light distribution phenomena; image modeling and formation; development of optical methods for image analysis and optical metrology including optical testing, materials characterization, NDT and industrial control and monitoring. The goal of this program is training a graduate capable to solve a wide range of research and engineering tasks in optical design and metrology leading to modern manufacturing and innovation. Variability of the program structure provides its flexibility and adoption according to current job market demands and personal learning paths for each student. In addition considerable proportion of internship and research expands practical skills. Some special features of the "Optical Design" program which implements the best practices of both Universities, the challenges and lessons learnt during its realization are presented in the paper.

Improving Metrological Reliability of Information-Measuring Systems Using Mathematical Modeling of Their Metrological Characteristics

NASA Astrophysics Data System (ADS)

Kurnosov, R. Yu; Chernyshova, T. I.; Chernyshov, V. N.

2018-05-01

The algorithms for improving the metrological reliability of analogue blocks of measuring channels and information-measuring systems are developed. The proposed algorithms ensure the optimum values of their metrological reliability indices for a given analogue circuit block solution.

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

NASA Astrophysics Data System (ADS)

Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

2004-05-01

Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will bring together formerly unlinked technology fields requiring new measurement science. The emphasis on accuracy will increase the importance and role of NIST and similar metrology organizations in supporting the semiconductor industry in this effort.

Mask Design for the Space Interferometry Mission Internal Metrology

NASA Technical Reports Server (NTRS)

Marx, David; Zhao, Feng; Korechoff, Robert

2005-01-01

This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

Gaps analysis for CD metrology beyond the 22nm node

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Germer, Thomas A.; Vartanian, Victor; Cordes, Aaron; Cepler, Aron; Settens, Charles

2013-04-01

This paper will examine the future for critical dimension (CD) metrology. First, we will present the extensive list of applications for which CD metrology solutions are needed, showing commonalities and differences among the various applications. We will then report on the expected technical limits of the metrology solutions currently being investigated by SEMATECH and others in the industry to address the metrology challenges of future nodes, including conventional CD scanning electron microscopy (CD-SEM) and optical critical dimension (OCD) metrology and new potential solutions such as He-ion microscopy (HeIM, sometimes elsewhere referred to as HIM), CD atomic force microscopy (CD-AFM), CD small-angle x-ray scattering (CD-SAXS), high-voltage scanning electron microscopy (HV-SEM), and other types. A technical gap analysis matrix will then be demonstrated, showing the current state of understanding of the future of the CD metrology space.

Evaluation of 3D metrology potential using a multiple detector CDSEM

NASA Astrophysics Data System (ADS)

Hakii, Hidemitsu; Yonekura, Isao; Nishiyama, Yasushi; Tanaka, Keishi; Komoto, Kenji; Murakawa, Tsutomu; Hiroyama, Mitsuo; Shida, Soichi; Kuribara, Masayuki; Iwai, Toshimichi; Matsumoto, Jun; Nakamura, Takayuki

2012-06-01

As feature sizes of semiconductor device structures have continuously decreased, needs for metrology tools with high precision and excellent linearity over actual pattern sizes have been growing. And it has become important to measure not only two-dimensional (2D) but also three-dimensional (3D) shapes of patterns at 22 nm node and beyond. To meet requirements for 3D metrology capabilities, various pattern metrology tools have been developed. Among those, we assume that CDSEM metrology is the most qualified candidate in the light of its non-destructive, high throughput measurement capabilities that are expected to be extended to the much-awaited 3D metrology technology. On the basis of this supposition, we have developed the 3D metrology system, in which side wall angles and heights of photomask patterns can be measured with high accuracy through analyzing CDSEM images generated by multi-channel detectors. In this paper, we will discuss our attempts to measure 3D shapes of defect patterns on a photomask by using Advantest's "Multi Vision Metrology SEM" E3630 (MVM-SEM' E3630).

Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

NASA Astrophysics Data System (ADS)

Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

2016-12-01

The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

Improving OCD time to solution using Signal Response Metrology

NASA Astrophysics Data System (ADS)

Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

2016-03-01

In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

WaferOptics® mass volume production and reliability

NASA Astrophysics Data System (ADS)

Wolterink, E.; Demeyer, K.

2010-05-01

The Anteryon WaferOptics® Technology platform contains imaging optics designs, materials, metrologies and combined with wafer level based Semicon & MEMS production methods. WaferOptics® first required complete new system engineering. This system closes the loop between application requirement specifications, Anteryon product specification, Monte Carlo Analysis, process windows, process controls and supply reject criteria. Regarding the Anteryon product Integrated Lens Stack (ILS), new design rules, test methods and control systems were assessed, implemented, validated and customer released for mass production. This includes novel reflowable materials, mastering process, replication, bonding, dicing, assembly, metrology, reliability programs and quality assurance systems. Many of Design of Experiments were performed to assess correlations between optical performance parameters and machine settings of all process steps. Lens metrologies such as FFL, BFL, and MTF were adapted for wafer level production and wafer mapping was introduced for yield management. Test methods for screening and validating suitable optical materials were designed. Critical failure modes such as delamination and popcorning were assessed and modeled with FEM. Anteryon successfully managed to integrate the different technologies starting from single prototypes to high yield mass volume production These parallel efforts resulted in a steep yield increase from 30% to over 90% in a 8 months period.

Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

NASA Astrophysics Data System (ADS)

Kim, Min-Suk; Won, Hwa-Yeon; Jeong, Jong-Mun; Böcker, Paul; Vergaij-Huizer, Lydia; Kupers, Michiel; Jovanović, Milenko; Sochal, Inez; Ryan, Kevin; Sun, Kyu-Tae; Lim, Young-Wan; Byun, Jin-Moo; Kim, Gwang-Gon; Suh, Jung-Joon

2016-03-01

In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrology at the edge of the wafer, to feed field-by-field corrections. Although field-by-field corrections can be effective in reducing localized overlay errors, the requirement for dense metrology to determine the corrections can become a limiting factor due to a significant increase of metrology time and cost. In this study, a more cost-effective solution has been found in extending the regular correction model with an edge-specific component. This new overlay correction model can be driven by an optimized, sparser sampling especially at the wafer edge area, and also allows for a reduction of noise propagation. Lithography correction potential has been maximized, with significantly less metrology needs. Evaluations have been performed, demonstrating the benefit of edge models in terms of on-product overlay performance, as well as cell based overlay performance based on metrology-to-cell matching improvements. Performance can be increased compared to POR modeling and sampling, which can contribute to (overlay based) yield improvement. Based on advanced modeling including edge components, metrology requirements have been optimized, enabling integrated metrology which drives down overall metrology fab footprint and lithography cycle time.

Metrology in physics, chemistry, and biology: differing perceptions.

PubMed

Iyengar, Venkatesh

2007-04-01

The association of physics and chemistry with metrology (the science of measurements) is well documented. For practical purposes, basic metrological measurements in physics are governed by two components, namely, the measure (i.e., the unit of measurement) and the measurand (i.e., the entity measured), which fully account for the integrity of a measurement process. In simple words, in the case of measuring the length of a room (the measurand), the SI unit meter (the measure) provides a direct answer sustained by metrological concepts. Metrology in chemistry, as observed through physical chemistry (measures used to express molar relationships, volume, pressure, temperature, surface tension, among others) follows the same principles of metrology as in physics. The same basis percolates to classical analytical chemistry (gravimetry for preparing high-purity standards, related definitive analytical techniques, among others). However, certain transition takes place in extending the metrological principles to chemical measurements in complex chemical matrices (e.g., food samples), as it adds a third component, namely, indirect measurements (e.g., AAS determination of Zn in foods). This is a practice frequently used in field assays, and calls for additional steps to account for traceability of such chemical measurements for safeguarding reliability concerns. Hence, the assessment that chemical metrology is still evolving.

Grazing Incidence Optics Technology

NASA Technical Reports Server (NTRS)

Ramsey, Brian; Smith, W. Scott; Gubarev, Mikhail; McCracken, Jeff

2015-01-01

This project is to demonstrate the capability to directly fabricate lightweight, high-resolution, grazing-incidence x-ray optics using a commercially available robotic polishing machine. Typical x-ray optics production at NASA Marshall Space Flight Center (MSFC) uses a replication process in which metal mirrors are electroformed on to figured and polished mandrels from which they are later removed. The attraction of this process is that multiple copies can be made from a single master. The drawback is that the replication process limits the angular resolution that can be attained. By directly fabricating each shell, errors inherent in the replication process are removed. The principal challenge now becomes how to support the mirror shell during all aspects of fabrication, including the necessary metrology to converge on the required mirror performance specifications. This program makes use of a Zeeko seven-axis computer-controlled polishing machine (see fig. 1) and supporting fabrication, metrology, and test equipment at MSFC. The overall development plan calls for proof-of-concept demonstration with relatively thick mirror shells (5-6 mm, fig. 2) which are straightforward to support and then a transition to much thinner shells (2-3 mm), which are an order of magnitude thinner than those used for Chandra. Both glass and metal substrates are being investigated. Currently, a thick glass shell is being figured. This has enabled experience to be gained with programming and operating the polishing machine without worrying about shell distortions or breakage. It has also allowed time for more complex support mechanisms for figuring/ polishing and metrology to be designed for the more challenging thinner shells. These are now in fabrication. Figure 1: Zeeko polishing machine.

Goniochromatic and sparkle properties of effect pigmented samples in multidimensional configuration

NASA Astrophysics Data System (ADS)

Höpe, Andreas; Hauer, Kai-Olaf; Teichert, Sven; Hünerhoff, Dirk; Strothkämper, Christian

2015-03-01

The effects of goniochromatism and sparkle are gaining more and more interest for surface refinement applications driven by demanding requirements from such different branches as automotive, cosmetics, printing and packaging industry. The common background and intention in all of these implementations is improvement of the visual appearance of the related commercial products. Goniochromatic materials show strong angular-dependent reflection characteristics and hence a color impression depending on the effective spatial arrangement of illumination and observation relative to the surface of the artifact. Sparkle is a texture related effect giving a surface which is irradiated directionally, like direct sun light, a bright glittering effect, similar to twinkling stars at the night sky. The prototype for this new effect is the Xirallic® pigment of MERCK KGaA, Germany. The same pigment shows in diffuse irradiation, like on a cloudy day, a different visual effect called graininess (coarseness) which appears as a granular structure of the surface. Both effects were studied on especially manufactured samples of a dilution series in pigment concentration and a tonality series with carbon black. The experiments were carried out with the robot-based gonioreflectometer and integrating sphere facilities at Physikalisch-Technische Bundesanstalt (PTB) in multidimensional configurations of directional and diffuse irradiation. The research is part of the European Metrology Research Program (EMRP), which is a metrology-focused program of coordinated Research & Development (R&D) funded by the European Commission and participating countries within the European Association of National Metrology Institutes (EURAMET). More information and updated news concerning the project can be found on the xD-Reflect website http://www.xdreflect.eu/.

Optical Performance Modeling of FUSE Telescope Mirror

NASA Technical Reports Server (NTRS)

Saha, Timo T.; Ohl, Raymond G.; Friedman, Scott D.; Moos, H. Warren

2000-01-01

We describe the Metrology Data Processor (METDAT), the Optical Surface Analysis Code (OSAC), and their application to the image evaluation of the Far Ultraviolet Spectroscopic Explorer (FUSE) mirrors. The FUSE instrument - designed and developed by the Johns Hopkins University and launched in June 1999 is an astrophysics satellite which provides high resolution spectra (lambda/Delta(lambda) = 20,000 - 25,000) in the wavelength region from 90.5 to 118.7 nm The FUSE instrument is comprised of four co-aligned, normal incidence, off-axis parabolic mirrors, four Rowland circle spectrograph channels with holographic gratings, and delay line microchannel plate detectors. The OSAC code provides a comprehensive analysis of optical system performance, including the effects of optical surface misalignments, low spatial frequency deformations described by discrete polynomial terms, mid- and high-spatial frequency deformations (surface roughness), and diffraction due to the finite size of the aperture. Both normal incidence (traditionally infrared, visible, and near ultraviolet mirror systems) and grazing incidence (x-ray mirror systems) systems can be analyzed. The code also properly accounts for reflectance losses on the mirror surfaces. Low frequency surface errors are described in OSAC by using Zernike polynomials for normal incidence mirrors and Legendre-Fourier polynomials for grazing incidence mirrors. The scatter analysis of the mirror is based on scalar scatter theory. The program accepts simple autocovariance (ACV) function models or power spectral density (PSD) models derived from mirror surface metrology data as input to the scatter calculation. The end product of the program is a user-defined pixel array containing the system Point Spread Function (PSF). The METDAT routine is used in conjunction with the OSAC program. This code reads in laboratory metrology data in a normalized format. The code then fits the data using Zernike polynomials for normal incidence systems or Legendre-Fourier polynomials for grazing incidence systems. It removes low order terms from the metrology data, calculates statistical ACV or PSD functions, and fits these data to OSAC models for the scatter analysis. In this paper we briefly describe the laboratory image testing of FUSE spare mirror performed in the near and vacuum ultraviolet at John Hopkins University and OSAC modeling of the test setup performed at NASA/GSFC. The test setup is a double-pass configuration consisting of a Hg discharge source, the FUSE off-axis parabolic mirror under test, an autocollimating flat mirror, and a tomographic imaging detector. Two additional, small fold flats are used in the optical train to accommodate the light source and the detector. The modeling is based on Zernike fitting and PSD analysis of surface metrology data measured by both the mirror vendor (Tinsley) and JHU. The results of our models agree well with the laboratory imaging data, thus validating our theoretical model. Finally, we predict the imaging performance of FUSE mirrors in their flight configuration at far-ultraviolet wavelengths.

Reducing the overlay metrology sensitivity to perturbations of the measurement stack

NASA Astrophysics Data System (ADS)

Zhou, Yue; Park, DeNeil; Gutjahr, Karsten; Gottipati, Abhishek; Vuong, Tam; Bae, Sung Yong; Stokes, Nicholas; Jiang, Aiqin; Hsu, Po Ya; O'Mahony, Mark; Donini, Andrea; Visser, Bart; de Ruiter, Chris; Grzela, Grzegorz; van der Laan, Hans; Jak, Martin; Izikson, Pavel; Morgan, Stephen

2017-03-01

Overlay metrology setup today faces a continuously changing landscape of process steps. During Diffraction Based Overlay (DBO) metrology setup, many different metrology target designs are evaluated in order to cover the full process window. The standard method for overlay metrology setup consists of single-wafer optimization in which the performance of all available metrology targets is evaluated. Without the availability of external reference data or multiwafer measurements it is hard to predict the metrology accuracy and robustness against process variations which naturally occur from wafer-to-wafer and lot-to-lot. In this paper, the capabilities of the Holistic Metrology Qualification (HMQ) setup flow are outlined, in particular with respect to overlay metrology accuracy and process robustness. The significance of robustness and its impact on overlay measurements is discussed using multiple examples. Measurement differences caused by slight stack variations across the target area, called grating imbalance, are shown to cause significant errors in the overlay calculation in case the recipe and target have not been selected properly. To this point, an overlay sensitivity check on perturbations of the measurement stack is presented for improvement of the overlay metrology setup flow. An extensive analysis on Key Performance Indicators (KPIs) from HMQ recipe optimization is performed on µDBO measurements of product wafers. The key parameters describing the sensitivity to perturbations of the measurement stack are based on an intra-target analysis. Using advanced image analysis, which is only possible for image plane detection of μDBO instead of pupil plane detection of DBO, the process robustness performance of a recipe can be determined. Intra-target analysis can be applied for a wide range of applications, independent of layers and devices.

Productivity Measurement in R&D: Productivity Measurement Experiment (PROMEX) in Selected Research and Development Programs at the National Bureau of Standards

DTIC Science & Technology

1975-12-01

Frequency Standards R. A. Kamper, Cryoelectronics D. B. Mann, Cryogenic Metrology Other Contributors: T. Dillon S. Dunaway J. Ellermeier K. T. Higgins R...research projects could be continuously assessed. Lipetz,, Ben-Ami. The Measueement of Efficiency of Scientific Research. Intermedia , Inc., Carlisle

Overlay accuracy fundamentals

NASA Astrophysics Data System (ADS)

Kandel, Daniel; Levinski, Vladimir; Sapiens, Noam; Cohen, Guy; Amit, Eran; Klein, Dana; Vakshtein, Irina

2012-03-01

Currently, the performance of overlay metrology is evaluated mainly based on random error contributions such as precision and TIS variability. With the expected shrinkage of the overlay metrology budget to < 0.5nm, it becomes crucial to include also systematic error contributions which affect the accuracy of the metrology. Here we discuss fundamental aspects of overlay accuracy and a methodology to improve accuracy significantly. We identify overlay mark imperfections and their interaction with the metrology technology, as the main source of overlay inaccuracy. The most important type of mark imperfection is mark asymmetry. Overlay mark asymmetry leads to a geometrical ambiguity in the definition of overlay, which can be ~1nm or less. It is shown theoretically and in simulations that the metrology may enhance the effect of overlay mark asymmetry significantly and lead to metrology inaccuracy ~10nm, much larger than the geometrical ambiguity. The analysis is carried out for two different overlay metrology technologies: Imaging overlay and DBO (1st order diffraction based overlay). It is demonstrated that the sensitivity of DBO to overlay mark asymmetry is larger than the sensitivity of imaging overlay. Finally, we show that a recently developed measurement quality metric serves as a valuable tool for improving overlay metrology accuracy. Simulation results demonstrate that the accuracy of imaging overlay can be improved significantly by recipe setup optimized using the quality metric. We conclude that imaging overlay metrology, complemented by appropriate use of measurement quality metric, results in optimal overlay accuracy.

EMPRESS: A European Project to Enhance Process Control Through Improved Temperature Measurement

NASA Astrophysics Data System (ADS)

Pearce, J. V.; Edler, F.; Elliott, C. J.; Rosso, L.; Sutton, G.; Andreu, A.; Machin, G.

2017-08-01

A new European project called EMPRESS, funded by the EURAMET program `European Metrology Program for Innovation and Research,' is described. The 3 year project, which started in the summer of 2015, is intended to substantially augment the efficiency of high-value manufacturing processes by improving temperature measurement techniques at the point of use. The project consortium has 18 partners and 5 external collaborators, from the metrology sector, high-value manufacturing, sensor manufacturing, and academia. Accurate control of temperature is key to ensuring process efficiency and product consistency and is often not achieved to the level required for modern processes. Enhanced efficiency of processes may take several forms including reduced product rejection/waste; improved energy efficiency; increased intervals between sensor recalibration/maintenance; and increased sensor reliability, i.e., reduced amount of operator intervention. Traceability of temperature measurements to the International Temperature Scale of 1990 (ITS-90) is a critical factor in establishing low measurement uncertainty and reproducible, consistent process control. Introducing such traceability in situ (i.e., within the industrial process) is a theme running through this project.

Electro-Optical Inspection For Tolerance Control As An Integral Part Of A Flexible Machining Cell

NASA Astrophysics Data System (ADS)

Renaud, Blaise

1986-11-01

Institut CERAC has been involved in optical metrology and 3-dimensional surface control for the last couple of years. Among the industrial applications considered is the on-line shape evaluation of machined parts within the manufacturing cell. The specific objective is to measure the machining errors and to compare them with the tolerances set by designers. An electro-optical sensing technique has been developed which relies on a projection Moire contouring optical method. A prototype inspection system has been designed, making use of video detection and computer image processing. Moire interferograms are interpreted, and the metrological information automatically retrieved. A structured database can be generated for subsequent data analysis and for real-time closed-loop corrective actions. A real-time kernel embedded into a synchronisation network (Petri-net) for the control of concurrent processes in the Electra-Optical Inspection (E0I) station was realised and implemented in a MODULA-2 program DIN01. The prototype system for on-line automatic tolerance control taking place within a flexible machining cell is described in this paper, together with the fast-prototype synchronisation program.

Metrological AFMs and its application for versatile nano-dimensional metrology tasks

NASA Astrophysics Data System (ADS)

Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

2010-08-01

Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

Metrological Support in Technosphere Safety

NASA Astrophysics Data System (ADS)

Akhobadze, G. N.

2017-11-01

The principle of metrological support in technosphere safety is considered. It is based on the practical metrology. The theoretical aspects of accuracy and errors of the measuring instruments intended for diagnostics and control of the technosphere under the influence of factors harmful to human beings are presented. The necessity to choose measuring devices with high metrological characteristics according to the accuracy class and contact of sensitive elements with a medium under control is shown. The types of additional errors in measuring instruments that arise when they are affected by environmental influences are described. A specific example of the analyzers application to control industrial emissions and measure the oil and particulate matter in wastewater is shown; it allows assessing advantages and disadvantages of analyzers. Besides, the recommendations regarding the missing metrological characteristics of the instruments in use are provided. The technosphere continuous monitoring taking into account the metrological principles is expected to efficiently forecast the technosphere development and make appropriate decisions.

PREFACE: 13th International Conference on Metrology and Properties of Engineering Surfaces

NASA Astrophysics Data System (ADS)

Leach, Richard

2011-08-01

The 13th International Conference on Metrology and Properties of Engineering Surfaces focused on the progress in surface metrology, surface characterisation instrumentation and properties of engineering surfaces. The conference provided an international forum for academics, industrialists and engineers from different disciplines to meet and exchange their ideas, results and latest research. The conference was held at Twickenham Stadium, situated approximately six miles from Heathrow Airport and approximately three miles from the National Physical Laboratory (NPL). This was the thirteenth in the very successful series of conferences, which have firmly established surface topography as a new and exciting interdisciplinary field of scientific and technological studies. Scientific Themes: Surface, Micro and Nano Metrology Measurement and Instrumentation Metrology for MST Devices Freeform Surface Measurement and Characterisation Uncertainty, Traceability and Calibration AFM/SPM Metrology Tribology and Wear Phenomena Functional Applications Stylus and Optical Instruments

Entanglement-enhanced quantum metrology in a noisy environment

NASA Astrophysics Data System (ADS)

Wang, Kunkun; Wang, Xiaoping; Zhan, Xiang; Bian, Zhihao; Li, Jian; Sanders, Barry C.; Xue, Peng

2018-04-01

Quantum metrology overcomes standard precision limits and plays a central role in science and technology. Practically, it is vulnerable to imperfections such as decoherence. Here we demonstrate quantum metrology for noisy channels such that entanglement with ancillary qubits enhances the quantum Fisher information for phase estimation but not otherwise. Our photonic experiment covers a range of noise for various types of channels, including for two randomly alternating channels such that assisted entanglement fails for each noisy channel individually. We simulate noisy channels by implementing space-multiplexed dual interferometers with quantum photonic inputs. We demonstrate the advantage of entanglement-assisted protocols in a phase estimation experiment run with either a single-probe or multiprobe approach. These results establish that entanglement with ancillae is a valuable approach for delivering quantum-enhanced metrology. Our approach to entanglement-assisted quantum metrology via a simple linear-optical interferometric network with easy-to-prepare photonic inputs provides a path towards practical quantum metrology.

A Roadmap for Thermal Metrology

NASA Astrophysics Data System (ADS)

Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

2009-02-01

A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

Metrology needs for the semiconductor industry over the next decade

NASA Astrophysics Data System (ADS)

Melliar-Smith, Mark; Diebold, Alain C.

1998-11-01

Metrology will continue to be a key enabler for the development and manufacture of future generations of integrated circuits. During 1997, the Semiconductor Industry Association renewed the National Technology Roadmap for Semiconductors (NTRS) through the 50 nm technology generation and for the first time included a Metrology Roadmap (1). Meeting the needs described in the Metrology Roadmap will be both a technological and financial challenge. In an ideal world, metrology capability would be available at the start of process and tool development, and silicon suppliers would have 450 mm wafer capable metrology tools in time for development of that wafer size. Unfortunately, a majority of the metrology suppliers are small companies that typically can't afford the additional two to three year wait for return on R&D investment. Therefore, the success of the semiconductor industry demands that we expand cooperation between NIST, SEMATECH, the National Labs, SRC, and the entire community. In this paper, we will discuss several critical metrology topics including the role of sensor-based process control, in-line microscopy, focused measurements for transistor and interconnect fabrication, and development needs. Improvements in in-line microscopy must extend existing critical dimension measurements up to 100 nm generations and new methods may be required for sub 100 nm generations. Through development, existing metrology dielectric thickness and dopant dose and junction methods can be extended to 100 nm, but new and possibly in-situ methods are needed beyond 100 nm. Interconnect process control will undergo change before 100 nm due to the introduction of copper metallization, low dielectric constant interlevel dielectrics, and Damascene process flows.

Assessing the Economic and National Security Benefits from Publicly Funded Technology Investments: An IDA Round Table.

DTIC Science & Technology

1995-09-01

strong commitment today, as in the past, is that of metrology —the science and technology of measurement. Metrology has applications in the areas of...problem- solving approach: NIST has earned a worldwide reputation for impartiality and techni- cal excellence. Its competencies in metrology —the science... metrological development5 NIST’s evaluations of industry’s technology needs indicate widespread demand for enhanced measurement capabilities, and

A European Roadmap for Thermophysical Properties Metrology

NASA Astrophysics Data System (ADS)

Filtz, J.-R.; Wu, J.; Stacey, C.; Hollandt, J.; Monte, C.; Hay, B.; Hameury, J.; Villamañan, M. A.; Thurzo-Andras, E.; Sarge, S.

2015-03-01

A roadmap for thermophysical properties metrology was developed in spring 2011 by the Thermophysical Properties Working Group in the EURAMET Technical Committee in charge of Thermometry, Humidity and Moisture, and Thermophysical Properties metrology. This roadmapping process is part of the EURAMET (European Association of National Metrology Institutes) activities aiming to increase impact from national investment in European metrology R&D. The roadmap shows a shared vision of how the development of thermophysical properties metrology should be oriented over the next 15 years to meet future social and economic needs. Since thermophysical properties metrology is a very broad and varied field, the authors have limited this roadmap to the following families of properties: thermal transport properties (thermal conductivity, thermal diffusivity, etc.), radiative properties (emissivity, absorbance, reflectance, and transmittance), caloric quantities (specific heat, enthalpy, etc.), thermodynamic properties (PVT and phase equilibria properties), and temperature-dependent quantities (thermal expansion, compressibility, etc.). This roadmap identifies the main societal and economical triggers that drive developments in thermophysical properties metrology. The key topics considered are energy, environment, advanced manufacturing and processing, public safety, security, and health. Key targets that require improved thermophysical properties measurements are identified in order to address these triggers. Ways are also proposed for defining the necessary skills and the main useful means to be implemented. These proposals will have to be revised as needs and technologies evolve in the future.

Industrial graphene metrology.

PubMed

Kyle, Jennifer Reiber; Ozkan, Cengiz S; Ozkan, Mihrimah

2012-07-07

Graphene is an allotrope of carbon whose structure is based on one-atom-thick planar sheets of carbon atoms that are densely packed in a honeycomb crystal lattice. Its unique electrical and optical properties raised worldwide interest towards the design and fabrication of future electronic and optical devices with unmatched performance. At the moment, extensive efforts are underway to evaluate the reliability and performance of a number of such devices. With the recent advances in synthesizing large-area graphene sheets, engineers have begun investigating viable methodologies for conducting graphene metrology and quality control at industrial scales to understand a variety of reliability issues including defects, patternability, electrical, and physical properties. This review summarizes the current state of industrial graphene metrology and provides an overview of graphene metrology techniques. In addition, a recently developed large-area graphene metrology technique based on fluorescence quenching is introduced. For each metrology technique, the industrial metrics it measures are identified--layer thickness, edge structure, defects, Fermi level, and thermal conductivity--and a detailed description is provided as to how the measurements are performed. Additionally, the potential advantages of each technique for industrial use are identified, including throughput, scalability, sensitivity to substrate/environment, and on their demonstrated ability to achieve quantified results. The recently developed fluorescence-quenching metrology technique is shown to meet all the necessary criteria for industrial applications, rendering it the first industry-ready graphene metrology technique.

CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)

NASA Astrophysics Data System (ADS)

Wallow, Thomas I.; Zhang, Chen; Fumar-Pici, Anita; Chen, Jun; Laenens, Bart; Spence, Christopher A.; Rio, David; van Adrichem, Paul; Dillen, Harm; Wang, Jing; Yang, Peng-Cheng; Gillijns, Werner; Jaenen, Patrick; van Roey, Frieda; van de Kerkhove, Jeroen; Babin, Sergey

2017-03-01

In the course of assessing OPC compact modeling capabilities and future requirements, we chose to investigate the interface between CD-SEM metrology methods and OPC modeling in some detail. Two linked observations motivated our study: 1) OPC modeling is, in principle, agnostic of metrology methods and best practice implementation. 2) Metrology teams across the industry use a wide variety of equipment, hardware settings, and image/data analysis methods to generate the large volumes of CD-SEM measurement data that are required for OPC in advanced technology nodes. Initial analyses led to the conclusion that many independent best practice metrology choices based on systematic study as well as accumulated institutional knowledge and experience can be reasonably made. Furthermore, these choices can result in substantial variations in measurement of otherwise identical model calibration and verification patterns. We will describe several experimental 2D test cases (i.e., metal, via/cut layers) that examine how systematic changes in metrology practice impact both the metrology data itself and the resulting full chip compact model behavior. Assessment of specific methodology choices will include: • CD-SEM hardware configurations and settings: these may range from SEM beam conditions (voltage, current, etc.,) to magnification, to frame integration optimizations that balance signal-to-noise vs. resist damage. • Image and measurement optimization: these may include choice of smoothing filters for noise suppression, threshold settings, etc. • Pattern measurement methodologies: these may include sampling strategies, CD- and contour- based approaches, and various strategies to optimize the measurement of complex 2D shapes. In addition, we will present conceptual frameworks and experimental methods that allow practitioners of OPC metrology to assess impacts of metrology best practice choices on model behavior. Finally, we will also assess requirements posed by node scaling on OPC model accuracy, and evaluate potential consequences for CD-SEM metrology capabilities and practices.

Laser Truss Sensor for Segmented Telescope Phasing

NASA Technical Reports Server (NTRS)

Liu, Duncan T.; Lay, Oliver P.; Azizi, Alireza; Erlig, Herman; Dorsky, Leonard I.; Asbury, Cheryl G.; Zhao, Feng

2011-01-01

A paper describes the laser truss sensor (LTS) for detecting piston motion between two adjacent telescope segment edges. LTS is formed by two point-to-point laser metrology gauges in a crossed geometry. A high-resolution (<30 nm) LTS can be implemented with existing laser metrology gauges. The distance change between the reference plane and the target plane is measured as a function of the phase change between the reference and target beams. To ease the bandwidth requirements for phase detection electronics (or phase meter), homodyne or heterodyne detection techniques have been used. The phase of the target beam also changes with the refractive index of air, which changes with the air pressure, temperature, and humidity. This error can be minimized by enclosing the metrology beams in baffles. For longer-term (weeks) tracking at the micron level accuracy, the same gauge can be operated in the absolute metrology mode with an accuracy of microns; to implement absolute metrology, two laser frequencies will be used on the same gauge. Absolute metrology using heterodyne laser gauges is a demonstrated technology. Complexity of laser source fiber distribution can be optimized using the range-gated metrology (RGM) approach.

Metrology in electricity and magnetism: EURAMET activities today and tomorrow

NASA Astrophysics Data System (ADS)

Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

2017-10-01

Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

Image-based overlay measurement using subsurface ultrasonic resonance force microscopy

NASA Astrophysics Data System (ADS)

Tamer, M. S.; van der Lans, M. J.; Sadeghian, H.

2018-03-01

Image Based Overlay (IBO) measurement is one of the most common techniques used in Integrated Circuit (IC) manufacturing to extract the overlay error values. The overlay error is measured using dedicated overlay targets which are optimized to increase the accuracy and the resolution, but these features are much larger than the IC feature size. IBO measurements are realized on the dedicated targets instead of product features, because the current overlay metrology solutions, mainly based on optics, cannot provide sufficient resolution on product features. However, considering the fact that the overlay error tolerance is approaching 2 nm, the overlay error measurement on product features becomes a need for the industry. For sub-nanometer resolution metrology, Scanning Probe Microscopy (SPM) is widely used, though at the cost of very low throughput. The semiconductor industry is interested in non-destructive imaging of buried structures under one or more layers for the application of overlay and wafer alignment, specifically through optically opaque media. Recently an SPM technique has been developed for imaging subsurface features which can be potentially considered as a solution for overlay metrology. In this paper we present the use of Subsurface Ultrasonic Resonance Force Microscopy (SSURFM) used for IBO measurement. We used SSURFM for imaging the most commonly used overlay targets on a silicon substrate and photoresist. As a proof of concept we have imaged surface and subsurface structures simultaneously. The surface and subsurface features of the overlay targets are fabricated with programmed overlay errors of +/-40 nm, +/-20 nm, and 0 nm. The top layer thickness changes between 30 nm and 80 nm. Using SSURFM the surface and subsurface features were successfully imaged and the overlay errors were extracted, via a rudimentary image processing algorithm. The measurement results are in agreement with the nominal values of the programmed overlay errors.

Improving the Cost Estimation of Space Systems. Past Lessons and Future Recommendations

DTIC Science & Technology

2008-01-01

a reasonable gauge for the relative propor- tions of cost growth attributable to errors, decisions, and other causes in any MDAP. Analysis of the...program. The program offices visited were the Defense Metrological Satellite Pro- gram (DMSP), Evolved Expendable Launch Vehicle (EELV), Advanced...3 years 1.8 0.9 3–8 years 1.8 0.9 8+ years 3.7 1.8 Staffing Requirement 7.4 3.7 areas represent earned value and budget drills ; the tan area on top

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Macdonald, Daniel R.; Diaz, Rosemary T.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission were used to search for locally anisotropic space-time, with a null result at the 10 to the negative tenth power level.

Test Evaluation and Modification of Prototype Rotating Gravity Gradiometer

DTIC Science & Technology

1975-07-01

RECOMMENEATIONS 3 4.0 BEARINGS 6 4.1 Design 6 4.2 Metrology 6 4.3 Preassembly 14 5.0 TEST RIG 17 5.1 Design 17 5.2 Metrology 21 5.3 Assembly and...print requirements of 5 \\i inches TIR max. However, because of available (stare-of-the-art) metrology equipment limitations, no conclusion as to...gravity gradiometer are contained in Shaker Research Corporation drawing series 101 (see Appendix I), 4.2 Metrology The production of the

education | News

Science.gov Websites

, agencies and professional associations. Introduction to metrology career day at St. Charles North High St. Charles North High School students to talk with them about metrology. Here, use a portable , a Fermilab metrology technical specialist, visited St. Charles North High School students to talk

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Diaz, Rosemary T.; Macdonald, Daniel R.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission, were used to search for locally anisotropic space-time, with a null result at the 10 to the negative 10th power level.

Metrology for the manufacturing of freeform optics

NASA Astrophysics Data System (ADS)

Blalock, Todd; Myer, Brian; Ferralli, Ian; Brunelle, Matt; Lynch, Tim

2017-10-01

Recently the use of freeform surfaces have become a realization for optical designers. These non-symmetrical optical surfaces have allowed unique solutions to optical design problems. The implementation of freeform optical surfaces has been limited by manufacturing capabilities and quality. However over the past several years freeform fabrication processes have improved in capability and precision. But as with any manufacturing, proper metrology is required to monitor and verify the process. Typical optics metrology such as interferometry has its challenges and limitations with the unique shapes of freeform optics. Two contact metrology methods for freeform metrology are presented; a Leitz coordinate measurement machine (CMM) with an uncertainty of +/- 0.5 μm and a high resolution profilometer (Panasonic UA3P) with a measurement uncertainty of +/- 0.05 μm. We are also developing a non-contact high resolution technique based on the fringe reflection technique known as deflectometry. This fast non-contact metrology has the potential to compete with accuracies of the contact methods but also can acquire data in seconds rather than minutes or hours.

Coherent X-ray beam metrology using 2D high-resolution Fresnel-diffraction analysis.

PubMed

Ruiz-Lopez, M; Faenov, A; Pikuz, T; Ozaki, N; Mitrofanov, A; Albertazzi, B; Hartley, N; Matsuoka, T; Ochante, Y; Tange, Y; Yabuuchi, T; Habara, T; Tanaka, K A; Inubushi, Y; Yabashi, M; Nishikino, M; Kawachi, T; Pikuz, S; Ishikawa, T; Kodama, R; Bleiner, D

2017-01-01

Direct metrology of coherent short-wavelength beamlines is important for obtaining operational beam characteristics at the experimental site. However, since beam-time limitation imposes fast metrology procedures, a multi-parametric metrology from as low as a single shot is desirable. Here a two-dimensional (2D) procedure based on high-resolution Fresnel diffraction analysis is discussed and applied, which allowed an efficient and detailed beamline characterization at the SACLA XFEL. So far, the potential of Fresnel diffraction for beamline metrology has not been fully exploited because its high-frequency fringes could be only partly resolved with ordinary pixel-limited detectors. Using the high-spatial-frequency imaging capability of an irradiated LiF crystal, 2D information of the coherence degree, beam divergence and beam quality factor M 2 were retrieved from simple diffraction patterns. The developed beam metrology was validated with a laboratory reference laser, and then successfully applied at a beamline facility, in agreement with the source specifications.

Analysis of key technologies for virtual instruments metrology

NASA Astrophysics Data System (ADS)

Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

2008-12-01

Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

Surface characterization and testing II; Proceedings of the Meeting, San Diego, CA, Aug. 10, 11, 1989

NASA Technical Reports Server (NTRS)

Greivenkamp, John E. (Editor); Young, Matt (Editor)

1989-01-01

Various papers on surface characterization and testing are presented. Individual topics addressed include: simple Hartmann test data interpretation, optimum configuration of the Offner null corrector, system for phase-shifting interferometry in the presence of vibration, fringe variation and visibility in speckle-shearing interferometry, functional integral representation of rough surfaces, calibration of surface heights in an interferometric optical profiler, image formation in common path differential profilometers, SEM of optical surfaces, measuring surface profiles with scanning tunneling microscopes, surface profile measurements of curved parts, high-resolution optical profiler, scanning heterodyne interferometer with immunity from microphonics, real-time crystal axis measurements of semiconductor materials, radial metrology with a panoramic annular lens, surface analysis for the characterization of defects in thin-film processes, Spacelab Optical Viewport glass assembly optical test program for the Starlab mission, scanning differential intensity and phase system for optical metrology.

Achieving the Heisenberg limit in quantum metrology using quantum error correction.

PubMed

Zhou, Sisi; Zhang, Mengzhen; Preskill, John; Jiang, Liang

2018-01-08

Quantum metrology has many important applications in science and technology, ranging from frequency spectroscopy to gravitational wave detection. Quantum mechanics imposes a fundamental limit on measurement precision, called the Heisenberg limit, which can be achieved for noiseless quantum systems, but is not achievable in general for systems subject to noise. Here we study how measurement precision can be enhanced through quantum error correction, a general method for protecting a quantum system from the damaging effects of noise. We find a necessary and sufficient condition for achieving the Heisenberg limit using quantum probes subject to Markovian noise, assuming that noiseless ancilla systems are available, and that fast, accurate quantum processing can be performed. When the sufficient condition is satisfied, a quantum error-correcting code can be constructed that suppresses the noise without obscuring the signal; the optimal code, achieving the best possible precision, can be found by solving a semidefinite program.

Issues of Teaching Metrology in Higher Education Institutions of Civil Engineering in Russia

ERIC Educational Resources Information Center

Pukharenko, Yurii Vladimirovich; Norin, Veniamin Aleksandrovich

2017-01-01

The work analyses the training process condition in teaching the discipline "Metrology, Standardization, Certification and Quality Control." It proves that the current educational standard regarding the instruction of the discipline "Metrology, Standardization, Certification and Quality Control" does not meet the needs of the…

Metrology Careers: Jobs for Good Measure

ERIC Educational Resources Information Center

Liming, Drew

2009-01-01

What kind of career rewards precision and accuracy? One in metrology--the science of measurement. By evaluating and calibrating the technology in people's everyday lives, metrologists keep their world running smoothly. Metrology is used in the design and production of almost everything people encounter daily, from the cell phones in their pockets…

Radioactive waste management: review on clearance levels and acceptance criteria legislation, requirements and standards.

PubMed

Maringer, F J; Suráň, J; Kovář, P; Chauvenet, B; Peyres, V; García-Toraño, E; Cozzella, M L; De Felice, P; Vodenik, B; Hult, M; Rosengård, U; Merimaa, M; Szücs, L; Jeffery, C; Dean, J C J; Tymiński, Z; Arnold, D; Hinca, R; Mirescu, G

2013-11-01

In 2011 the joint research project Metrology for Radioactive Waste Management (MetroRWM)(1) of the European Metrology Research Programme (EMRP) started with a total duration of three years. Within this project, new metrological resources for the assessment of radioactive waste, including their calibration with new reference materials traceable to national standards will be developed. This paper gives a review on national, European and international strategies as basis for science-based metrological requirements in clearance and acceptance of radioactive waste. © 2013 Elsevier Ltd. All rights reserved.

Adjustment method for embedded metrology engine in an EM773 series microcontroller.

PubMed

Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

2015-09-01

This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

The European Comparison of Absolute Gravimeters 2011 (ECAG-2011) in Walferdange, Luxembourg: results and recommendations

NASA Astrophysics Data System (ADS)

Francis, Olivier; Baumann, Henri; Volarik, Tomas; Rothleitner, Christian; Klein, Gilbert; Seil, Marc; Dando, Nicolas; Tracey, Ray; Ullrich, Christian; Castelein, Stefaan; Hua, Hu; Kang, Wu; Chongyang, Shen; Songbo, Xuan; Hongbo, Tan; Zhengyuan, Li; Pálinkás, Vojtech; Kostelecký, Jakub; Mäkinen, Jaakko; Näränen, Jyri; Merlet, Sébastien; Farah, Tristan; Guerlin, Christine; Pereira Dos Santos, Franck; Le Moigne, Nicolas; Champollion, Cédric; Deville, Sabrina; Timmen, Ludger; Falk, Reinhard; Wilmes, Herbert; Iacovone, Domenico; Baccaro, Francesco; Germak, Alessandro; Biolcati, Emanuele; Krynski, Jan; Sekowski, Marcin; Olszak, Tomasz; Pachuta, Andrzej; Agren, Jonas; Engfeldt, Andreas; Reudink, René; Inacio, Pedro; McLaughlin, Daniel; Shannon, Geoff; Eckl, Marc; Wilkins, Tim; van Westrum, Derek; Billson, Ryan

2013-06-01

We present the results of the third European Comparison of Absolute Gravimeters held in Walferdange, Grand Duchy of Luxembourg, in November 2011. Twenty-two gravimeters from both metrological and non-metrological institutes are compared. For the first time, corrections for the laser beam diffraction and the self-attraction of the gravimeters are implemented. The gravity observations are also corrected for geophysical gravity changes that occurred during the comparison using the observations of a superconducting gravimeter. We show that these corrections improve the degree of equivalence between the gravimeters. We present the results for two different combinations of data. In the first one, we use only the observations from the metrological institutes. In the second solution, we include all the data from both metrological and non-metrological institutes. Those solutions are then compared with the official result of the comparison published previously and based on the observations of the metrological institutes and the gravity differences at the different sites as measured by non-metrological institutes. Overall, the absolute gravity meters agree with one another with a standard deviation of 3.1 µGal. Finally, the results of this comparison are linked to previous ones. We conclude with some important recommendations for future comparisons.

Range-Gated Metrology: An Ultra-Compact Sensor for Dimensional Stabilization

NASA Technical Reports Server (NTRS)

Lay, Oliver P.; Dubovitsky, Serge; Shaddock, Daniel A.; Ware, Brent; Woodruff, Christopher S.

2008-01-01

Point-to-point laser metrology systems can be used to stabilize large structures at the nanometer levels required for precision optical systems. Existing sensors are large and intrusive, however, with optical heads that consist of several optical elements and require multiple optical fiber connections. The use of point-to-point laser metrology has therefore been limited to applications where only a few gauges are needed and there is sufficient space to accommodate them. Range-Gated Metrology is a signal processing technique that preserves nanometer-level or better performance while enabling: (1) a greatly simplified optical head - a single fiber optic collimator - that can be made very compact, and (2) a single optical fiber connection that is readily multiplexed. This combination of features means that it will be straightforward and cost-effective to embed tens or hundreds of compact metrology gauges to stabilize a large structure. In this paper we describe the concept behind Range-Gated Metrology, demonstrate the performance in a laboratory environment, and give examples of how such a sensor system might be deployed.

The Development of a Deflectometer for Accurate Surface Figure Metrology

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Eberhardt, Andrew; Ramsey, Brian; Atkins, Carolyn

2015-01-01

Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication

Coordinate metrology using scanning probe microscopes

NASA Astrophysics Data System (ADS)

Marinello, F.; Savio, E.; Bariani, P.; Carmignato, S.

2009-08-01

New positioning, probing and measuring strategies in coordinate metrology are needed for the accomplishment of true three-dimensional characterization of microstructures, with uncertainties in the nanometre range. In the present work, the implementation of scanning probe microscopes (SPMs) as systems for coordinate metrology is discussed. A new non-raster measurement approach is proposed, where the probe is moved to sense points along free paths on the sample surface, with no loss of accuracy with respect to traditional raster scanning and scan time reduction. Furthermore, new probes featuring long tips with innovative geometries suitable for coordinate metrology through SPMs are examined and reported.

Surface Wave Metrology for Copper/Low-k Interconnects

NASA Astrophysics Data System (ADS)

Gostein, M.; Maznev, A. A.; Mazurenko, A.; Tower, J.

2005-09-01

We review recent advances in the application of laser-induced surface acoustic wave metrology to issues in copper/low-k interconnect development and manufacturing. We illustrate how the metrology technique can be used to measure copper thickness uniformity on a range of features from solid pads to arrays of lines, focusing on specific processing issues in copper electrochemical deposition (ECD) and chemical-mechanical polishing (CMP). In addition, we review recent developments in surface wave metrology for the characterization of low-k dielectric elastic modulus, including the ability to measure within-wafer uniformity of elastic modulus and to characterize porous, anisotropic films.

Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry

NASA Astrophysics Data System (ADS)

Supranowitz, Chris; Maloney, Chris; Murphy, Paul; Dumas, Paul

2017-10-01

Recent advances in polishing and metrology have addressed many of the challenges in the fabrication and metrology of freeform surfaces, and the manufacture of these surfaces is possible today. However, achieving the form and mid-spatial frequency (MSF) specifications that are typical of visible imaging systems remains a challenge. Interferometric metrology for freeform surfaces is thus highly desirable for such applications, but the capability is currently quite limited for freeforms. In this paper, we provide preliminary results that demonstrate accurate, high-resolution measurements of freeform surfaces using prototype software on QED's ASI™ (Aspheric Stitching Interferometer).

Roles of chemical metrology in electronics industry and associated environment in Korea: a tutorial.

PubMed

Kang, Namgoo; Joong Kim, Kyung; Seog Kim, Jin; Hae Lee, Joung

2015-03-01

Chemical metrology is gaining importance in electronics industry that manufactures semiconductors, electronic displays, and microelectronics. Extensive and growing needs from this industry have raised the significance of accurate measurements of the amount of substances and material properties. For the first time, this paper presents information on how chemical metrology is being applied to meet a variety of needs in the aspects of quality control of electronics products and environmental regulations closely associated with electronics industry. For a better understanding of the roles of the chemical metrology within electronics industry, the recent research activities and results in chemical metrology are presented using typical examples in Korea where electronic industry is leading a national economy. Particular attention is paid to the applications of chemical metrology for advancing emerging electronics technology developments. Such examples are a novel technique for the accurate quantification of gas composition at nano-liter levels within a MEMS package, the surface chemical analysis of a semiconductor device. Typical metrological tools are also presented for the development of certified reference materials for fluorinated greenhouse gases and proficiency testing schemes for heavy metals and chlorinated toxic gas in order to cope properly with environmental issues within electronics industry. In addition, a recent technique is presented for the accurate measurement of the destruction and removal efficiency of a typical greenhouse gas scrubber. Copyright © 2014 Elsevier B.V. All rights reserved.

Fabrication High Resolution Metrology Target By Step And Repeat Method

NASA Astrophysics Data System (ADS)

Dusa, Mircea

1983-10-01

Based on the photolithography process generally used to generate high resolution masks for semiconductor I.C.S, we found a very useful industrial application of laser technology.First, we have generated high resolution metrology targets which are used in industrial measurement laser interferometers as difra.ction gratings. Secondi we have generated these targets using step and repeat machine, with He-Ne laser interferometer controlled state, as a pattern generator, due to suitable computer programming.Actually, high resolution metrology target, means two chromium plates, one of which is called the" rule" the other one the "vernier". In Fig.1 we have the configuration of the rule and the vernier. The rule has a succesion of 3 μM lines generated as a difraction grating on a 4 x 4 inch chromium blank. The vernier has several exposed fields( areas) having 3 - 15 μm lines, fields placed on very precise position on the chromium blank surface. High degree of uniformity, tight CD tolerances, low defect density required by the targets, creates specialised problems during processing. Details of the processing, together with experimental results will be presented. Before we start to enter into process details, we have to point out that the dimensional requirements of the reticle target, are quite similar or perhaps more strict than LSI master casks. These requirements presented in Fig.2.

DOE Office of Scientific and Technical Information (OSTI.GOV)

C. Priniski, T. Dodson, M. Duco, S. Raftopoulos, R. Ellis, and A. Brooks

In support of the National Compact Stellerator Experiment (NCSX), stellerator assembly activities continued this past year at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The construction program saw the completion of the first two Half Field-Period Assemblies (HPA), each consisting of three modular coils. The full machine includes six such sub-assemblies. A single HPA consists of three of the NCSX modular coils wound and assembled at PPPL. These geometrically-complex threedimensional coils were wound using computer-aided metrology and CAD models to tolerances within +/- 0.5mm. The assembly of these coils required similar accuracymore » on a larger scale with the added complexity of more individual parts and fewer degrees of freedom for correction. Several new potential positioning issues developed for which measurement and control techniques were developed. To accomplish this, CAD coordinate-based computer metrology equipment and software similar to the solutions employed for winding the modular coils was used. Given the size of the assemblies, the primary tools were both interferometeraided and Absolute Distance Measurement (ADM)-only based laser trackers. In addition, portable Coordinate Measurement Machine (CMM) arms and some novel indirect measurement techniques were employed. This paper will detail both the use of CAD coordinate-based metrology technology and the techniques developed and employed for dimensional control of NSCX subassemblies. The results achieved and possible improvements to techniques will be discussed.« less

Ice flood velocity calculating approach based on single view metrology

NASA Astrophysics Data System (ADS)

Wu, X.; Xu, L.

2017-02-01

Yellow River is the river in which the ice flood occurs most frequently in China, hence, the Ice flood forecasting has great significance for the river flood prevention work. In various ice flood forecast models, the flow velocity is one of the most important parameters. In spite of the great significance of the flow velocity, its acquisition heavily relies on manual observation or deriving from empirical formula. In recent years, with the high development of video surveillance technology and wireless transmission network, the Yellow River Conservancy Commission set up the ice situation monitoring system, in which live videos can be transmitted to the monitoring center through 3G mobile networks. In this paper, an approach to get the ice velocity based on single view metrology and motion tracking technique using monitoring videos as input data is proposed. First of all, River way can be approximated as a plane. On this condition, we analyze the geometry relevance between the object side and the image side. Besides, we present the principle to measure length in object side from image. Secondly, we use LK optical flow which support pyramid data to track the ice in motion. Combining the result of camera calibration and single view metrology, we propose a flow to calculate the real velocity of ice flood. At last we realize a prototype system by programming and use it to test the reliability and rationality of the whole solution.

Metrology for Information Technology

DTIC Science & Technology

1997-05-01

Technology (IT) MEL/ITL Task Group on Metrology for Information Technology (IT) U.S. DEPARTMENT OF COMMERCE Technology Administration National Institute of...NIST management requested a white paper on metrology for information technology (IT). A task group was formed to develop this white paper with...representatives from the Manufacturing Engineering Laboratory (MEL), the Information Technology Laboratory (ITL), and Technology Services (TS). The task

On the benefit of high resolution and low aberrations for in-die mask registration metrology

NASA Astrophysics Data System (ADS)

Beyer, Dirk; Seidel, Dirk; Heisig, Sven; Steinert, Steffen; Töpfer, Susanne; Scherübl, Thomas; Hetzler, Jochen

2014-10-01

With the introduction of complex lithography schemes like double and multi - patterning and new design principles like gridded designs with cut masks the requirements for mask to mask overlay have increased dramatically. Still, there are some good news too for the mask industry since more mask are needed and qualified. Although always confronted with throughput demands, latest writing tool developments are able to keep pace with ever increasing pattern placement specs not only for global signatures but for in-die features within the active area. Placement specs less than 3nm (max. 3 Sigma) are expected and needed in all cases in order to keep the mask contribution to the overall overlay budget at an accepted level. The qualification of these masks relies on high precision metrology tools which have to fulfill stringent metrology as well as resolution constrains at the same time. Furthermore, multi-patterning and gridded designs with pinhole type cut masks are drivers for a paradigm shift in registration metrology from classical registration crosses to in-die registration metrology on production features. These requirements result in several challenges for registration metrology tools. The resolution of the system must be sufficiently high to resolve small production features. At the same time tighter repeatability is required. Furthermore, tool induced shift (TIS) limit the accuracy of in-die measurements. This paper discusses and demonstrates the importance of low illumination wavelength together with low aberrations for best contrast imaging for in-die registration metrology. Typical effects like tool induced shift are analyzed and evaluated using the ZEISS PROVE® registration metrology tool. Additionally, we will address performance gains when going to higher resolution. The direct impact on repeatability for small features by registration measurements will be discussed as well.

Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

NASA Astrophysics Data System (ADS)

Dervilllé, A.; Labrosse, A.; Zimmermann, Y.; Foucher, J.; Gronheid, R.; Boeckx, C.; Singh, A.; Leray, P.; Halder, S.

2016-03-01

The dimensional scaling in IC manufacturing strongly drives the demands on CD and defect metrology techniques and their measurement uncertainties. Defect review has become as important as CD metrology and both of them create a new metrology paradigm because it creates a completely new need for flexible, robust and scalable metrology software. Current, software architectures and metrology algorithms are performant but it must be pushed to another higher level in order to follow roadmap speed and requirements. For example: manage defect and CD in one step algorithm, customize algorithms and outputs features for each R&D team environment, provide software update every day or every week for R&D teams in order to explore easily various development strategies. The final goal is to avoid spending hours and days to manually tune algorithm to analyze metrology data and to allow R&D teams to stay focus on their expertise. The benefits are drastic costs reduction, more efficient R&D team and better process quality. In this paper, we propose a new generation of software platform and development infrastructure which can integrate specific metrology business modules. For example, we will show the integration of a chemistry module dedicated to electronics materials like Direct Self Assembly features. We will show a new generation of image analysis algorithms which are able to manage at the same time defect rates, images classifications, CD and roughness measurements with high throughput performances in order to be compatible with HVM. In a second part, we will assess the reliability, the customization of algorithm and the software platform capabilities to follow new specific semiconductor metrology software requirements: flexibility, robustness, high throughput and scalability. Finally, we will demonstrate how such environment has allowed a drastic reduction of data analysis cycle time.

Hybrid enabled thin film metrology using XPS and optical

NASA Astrophysics Data System (ADS)

Vaid, Alok; Iddawela, Givantha; Mahendrakar, Sridhar; Lenahan, Michael; Hossain, Mainul; Timoney, Padraig; Bello, Abner F.; Bozdog, Cornel; Pois, Heath; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Kang, Byung Cheol; Isbester, Paul; Sendelbach, Matthew; Yellai, Naren; Dasari, Prasad; Larson, Tom

2016-03-01

Complexity of process steps integration and material systems for next-generation technology nodes is reaching unprecedented levels, the appetite for higher sampling rates is on the rise, while the process window continues to shrink. Current thickness metrology specifications reach as low as 0.1A for total error budget - breathing new life into an old paradigm with lower visibility for past few metrology nodes: accuracy. Furthermore, for advance nodes there is growing demand to measure film thickness and composition on devices/product instead of surrogate planar simpler pads. Here we extend our earlier work in Hybrid Metrology to the combination of X-Ray based reference technologies (high performance) with optical high volume manufacturing (HVM) workhorse metrology (high throughput). Our stated goal is: put more "eyes" on the wafer (higher sampling) and enable move to films on pattern structure (control what matters). Examples of 1X front-end applications are used to setup and validate the benefits.

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

NASA Astrophysics Data System (ADS)

Smilde, Henk-Jan H.; den Boef, Arie; Kubis, Michael; Jak, Martin; van Schijndel, Mark; Fuchs, Andreas; van der Schaar, Maurits; Meyer, Steffen; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Wang, Cathy; Bhattacharyya, Kaustuve; Chen, Kai-Hsiung; Huang, Guo-Tsai; Ke, Chih-Ming; Huang, Jacky

2012-03-01

Reducing the size of metrology targets is essential for in-die overlay metrology in advanced semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) measurements with a YieldStar metrology tool are presented for target-sizes down to 10 × 10 μm2. The μDBO technology enables selection of only the diffraction efficiency information from the grating by efficiently separating it from product structure reflections. Therefore, μDBO targets -even when located adjacent to product environment- give excellent correlation with 40 × 160 μm2 reference targets. Although significantly smaller than standard scribe-line targets, they can achieve total-measurement-uncertainty values of below 0.5 nm on a wide range of product layers. This shows that the new μDBO technique allows for accurate metrology on ultra small in-die targets, while retaining the excellent TMU performance of diffraction-based overlay metrology.

Final Report on the Key Comparison CCM.P-K4.2012 in Absolute Pressure from 1 Pa to 10 kPa

PubMed Central

Ricker, Jacob; Hendricks, Jay; Bock, Thomas; Dominik, Pražák; Kobata, Tokihiko; Torres, Jorge; Sadkovskaya, Irina

2017-01-01

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Institute of Japan (NMIJ), Centro Nacional de Metrología (CENAM), and DI Mendeleyev Institute for Metrology (VNIIM). The comparison was made via a calibrated transfer standard measured at each of the NMIs facilities using their laboratory standard during the period May 2012 to September 2013. The transfer package constructed for this comparison preformed as designed and provided a stable artifact to compare laboratory standards. Overall the participants were found to be statistically equivalent to the key comparison reference value. PMID:28216793

A Machine Vision System for Automatically Grading Hardwood Lumber - (Industrial Metrology)

Treesearch

Richard W. Conners; Tai-Hoon Cho; Chong T. Ng; Thomas T. Drayer; Philip A. Araman; Robert L. Brisbon

1992-01-01

Any automatic system for grading hardwood lumber can conceptually be divided into two components. One of these is a machine vision system for locating and identifying grading defects. The other is an automatic grading program that accepts as input the output of the machine vision system and, based on these data, determines the grade of a board. The progress that has...

EDITORIAL: Nanometrology Nanometrology

NASA Astrophysics Data System (ADS)

Tanaka, Mitsuru; Baba, Tetsuya; Postek, Michael T.

2011-02-01

Nanomanufacturing is an essential bridge between the discoveries of nanoscience and real-world nanotech products and is the vehicle by which the world will realize the promise of major technological innovation across a spectrum of products that will affect virtually every industrial sector. For micro and nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, economical and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust manufacturing at the nanoscale is the development of the necessary instrumentation, metrology and standards, i.e. nanometrology. The National Measurement Laboratories are committed to developing the required metrology. Integration of the instruments, their interoperability and appropriate information management are also critical elements that must be considered for viable micro and nanomanufacturing. Advanced instrumentation, metrology and standards will allow the physical dimensions, properties, functionality and purity of the materials, processes, tools, systems, products and emissions that will constitute micro and nanomanufacturing to be measured and characterized. This will in turn enable production to be scalable, controllable, predictable and repeatable to meet market needs. If a product cannot be measured it cannot be manufactured; if that product cannot be made safely it should not be manufactured, and finally, if the metrology is not in place how would you know? The articles in this special feature can be classified into three categories: dimensional metrology (8 papers and one technical design note), density of particles (2 papers) and metrology of thermal properties (3 papers). The articles on dimensional metrology include scanning probe microscope dimensional metrology, the through focus scanning optical (TSOM) imaging method, scatterfield optical microscopy, helium ion microscopy, metrology and combinations of these microscopy and imaging techniques applied to nanostructures and particles such as cellulose nanocrystals, and targeted liposome-based delivery systems. Dimensional metrology covers grating pitch measurement by optical diffraction, measurement of the thickness of silicon oxide by synchrotron radiation x-ray photoelectron spectroscopy (SR-XPS) analysis and determination of pore size distribution of porous low-dielectric-constant films by x-ray scattering. The two papers on particle density present number concentration standards for aerosol nanoparticles of larger diameter than about 10 nm and liquid-borne particles in the range of 10-20 µm diameter, respectively. The three papers on metrology of thermal properties present recent innovative progress in thermophysical metrology of thin films by the ultrafast laser flash methods required for understanding of the thermal science at nanoscales and thermal design of nanodevices. The first paper improves the technology applicable under high pressures in a diamond anvil cell. The second extends this technology to thin films on silicon substrates. The third reports the first observation of non-diffusive heat transfer across thin films at low temperatures. In order to guarantee reliability and traceability of developed measurement methods for nanomaterials, a technical infrastructure for nanomaterials such as metrological standards, reference materials and document standards for measurement methods is important. We hope this special feature will be the first step in a collaboration towards a global harmonization of nanometrology.

Manufacturing Laboratory for Next Generation Engineers

DTIC Science & Technology

2013-12-16

automated CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine...CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine, plasma...System Metrology and Quality Control Equipment - This area already had a CMM and other well known quality control instrumentation. It has been enhanced

Emerging technology for astronomical optics metrology

NASA Astrophysics Data System (ADS)

Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

2018-05-01

Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

IT Security Standards and Legal Metrology - Transfer and Validation

NASA Astrophysics Data System (ADS)

Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

2014-08-01

Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

A metrological approach to improve accuracy and reliability of ammonia measurements in ambient air

NASA Astrophysics Data System (ADS)

Pogány, Andrea; Balslev-Harder, David; Braban, Christine F.; Cassidy, Nathan; Ebert, Volker; Ferracci, Valerio; Hieta, Tuomas; Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Peltola, Jari; Persijn, Stefan; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-11-01

The environmental impacts of ammonia (NH3) in ambient air have become more evident in the recent decades, leading to intensifying research in this field. A number of novel analytical techniques and monitoring instruments have been developed, and the quality and availability of reference gas mixtures used for the calibration of measuring instruments has also increased significantly. However, recent inter-comparison measurements show significant discrepancies, indicating that the majority of the newly developed devices and reference materials require further thorough validation. There is a clear need for more intensive metrological research focusing on quality assurance, intercomparability and validations. MetNH3 (Metrology for ammonia in ambient air) is a three-year project within the framework of the European Metrology Research Programme (EMRP), which aims to bring metrological traceability to ambient ammonia measurements in the 0.5-500 nmol mol-1 amount fraction range. This is addressed by working in three areas: (1) improving accuracy and stability of static and dynamic reference gas mixtures, (2) developing an optical transfer standard and (3) establishing the link between high-accuracy metrological standards and field measurements. In this article we describe the concept, aims and first results of the project.

Forensic Metrology: Its Importance and Evolution in the United States

NASA Astrophysics Data System (ADS)

Vosk, JD Ted

2016-11-01

Forensic measurements play a significant role in the U.S. criminal justice system. Guilt or innocence, or the severity of a sentence, may depend upon the results of such measurements. Until recently, however, forensic disciplines were largely unaware of the field of metrology. Accordingly, proper measurement practices were often, and widely, neglected. These include failure to adopt proper calibration techniques, establish the traceability of results and determine measurement uncertainty. These failures undermine confidence in verdicts based upon forensic measurements. Over the past decade, though, the forensic sciences have been introduced to metrology and its principles leading to more reliable measurement practices. The impetus for this change was driven by many forces. Pressure came initially from criminal defense lawyers challenging metrologically unsound practices and results relied upon by government prosecutions. Litigation in the State of Washington led this movement spurring action by attorneys in other jurisdictions and eventually reform in the measurement practices of forensic labs around the country. Since then, the greater scientific community, other forensic scientists and even prosecutors have joined the fight. This paper describes the fight to improve the quality of justice by the application of metrological principles and the evolution of the field of forensic metrology.

PREFACE: 3rd International Congress on Mechanical Metrology (CIMMEC2014)

NASA Astrophysics Data System (ADS)

2015-10-01

From October 14th to 16th 2014, The Brazilian National Institute of Metrology, Quality, and Technology (Inmetro) and the Brazilian Society of Metrology (SBM) organized the 3rd International Congress on Mechanical Metrology (3rd CIMMEC). The 3rd CIMMEC was held in the city of Gramado, Rio Grande do Sul, Brazil. Anticipating the interest and enthusiasm of the technical-scientific community, the Organizing Institutions invite people and organizations to participate in this important congress, reiterating the commitment to organize an event according to highest international standards. This event has been conceived to integrate people and organizations from Brazil and abroad in the discussion of advanced themes in metrology. Manufacturers and dealers of measuring equipment and standards, as well as of auxiliary accessories and bibliographic material, had the chance to promote their products and services in stands at the Fair, which has taken place alongside the Congress. The 3rd CIMMEC consisted of five Keynote Speeches and 116 regular papers. Among the regular papers, the 25 most outstanding ones, comprising a high quality content on Mechanical Metrology, were selected to be published in this issue of Journal of Physics: Conference Series. It is our great pleasure to present this volume of Journal of Physics: Conference Series to the scientific community to promote further research in Mechanical Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by CIMMEC 2014.

Implementation and performance of the metrology system for the multi-object optical and near-infrared spectrograph MOONS

NASA Astrophysics Data System (ADS)

Drass, Holger; Vanzi, Leonardo; Torres-Torriti, Miguel; Dünner, Rolando; Shen, Tzu-Chiang; Belmar, Francisco; Dauvin, Lousie; Staig, Tomás.; Antognini, Jonathan; Flores, Mauricio; Luco, Yerko; Béchet, Clémentine; Boettger, David; Beard, Steven; Montgomery, David; Watson, Stephen; Cabral, Alexandre; Hayati, Mahmoud; Abreu, Manuel; Rees, Phil; Cirasuolo, Michele; Taylor, William; Fairley, Alasdair

2016-08-01

The Multi-Object Optical and Near-infrared Spectrograph (MOONS) will cover the Very Large Telescope's (VLT) field of view with 1000 fibres. The fibres will be mounted on fibre positioning units (FPU) implemented as two-DOF robot arms to ensure a homogeneous coverage of the 500 square arcmin field of view. To accurately and fast determine the position of the 1000 fibres a metrology system has been designed. This paper presents the hardware and software design and performance of the metrology system. The metrology system is based on the analysis of images taken by a circular array of 12 cameras located close to the VLTs derotator ring around the Nasmyth focus. The system includes 24 individually adjustable lamps. The fibre positions are measured through dedicated metrology targets mounted on top of the FPUs and fiducial markers connected to the FPU support plate which are imaged at the same time. A flexible pipeline based on VLT standards is used to process the images. The position accuracy was determined to 5 μm in the central region of the images. Including the outer regions the overall positioning accuracy is 25 μm. The MOONS metrology system is fully set up with a working prototype. The results in parts of the images are already excellent. By using upcoming hardware and improving the calibration it is expected to fulfil the accuracy requirement over the complete field of view for all metrology cameras.

JPRS Report, Science & Technology, USSR: Science & Technology Policy

DTIC Science & Technology

1988-04-05

associa- tions—were formulated. Specialists, A. V. Glichev, direc- tor of the All-Union Institute of Metrology and Stan- dardization of the USSR State...Various functional subdi- visions—laboratories of reliability, metrological labora- tories, monitoring and diagnostic centers, and so forth— are...department for standards, metrology , and quality. The latter annually does not approve and sends back for modification up to 20 of the "notebooks of

Integrating Residual Stress Analysis of Critical Fastener Holes into USAF Depot Maintenance

DTIC Science & Technology

2014-11-02

40 Table 15. Metrology of the initial reamer, initial hole diameters, and resulting CX for the class/type hole combinations for Pattern 1...70 Table 16. Metrology of the initial reamer, initial hole diameters, and resulting...step in the cold work process. These procedures produce a digital documentation of the hole, based on critical metrology , which can be linked with

In-Process Metrology And Control Of Large Optical Grinders

NASA Astrophysics Data System (ADS)

Anderson, D. S.; Ketelsen, D.; Kittrell, W. Cary; Kuhn, Wm; Parks, R. E.; Stahl, P.

1987-01-01

The advent of rapid figure generation at the University of Arizona has prompted the development of rapid metrology techniques. The success and efficiency of the generating process is highly dependent on timely and accurate measurements to update the feedback loop between machine and optician. We will describe the advantages and problems associated with the in-process metrology and control systems used at the Optical Sciences Center.

Deep machine learning based Image classification in hard disk drive manufacturing (Conference Presentation)

NASA Astrophysics Data System (ADS)

Rana, Narender; Chien, Chester

2018-03-01

A key sensor element in a Hard Disk Drive (HDD) is the read-write head device. The device is complex 3D shape and its fabrication requires over thousand process steps with many of them being various types of image inspection and critical dimension (CD) metrology steps. In order to have high yield of devices across a wafer, very tight inspection and metrology specifications are implemented. Many images are collected on a wafer and inspected for various types of defects and in CD metrology the quality of image impacts the CD measurements. Metrology noise need to be minimized in CD metrology to get better estimate of the process related variations for implementing robust process controls. Though there are specialized tools available for defect inspection and review allowing classification and statistics. However, due to unavailability of such advanced tools or other reasons, many times images need to be manually inspected. SEM Image inspection and CD-SEM metrology tools are different tools differing in software as well. SEM Image inspection and CD-SEM metrology tools are separate tools differing in software and purpose. There have been cases where a significant numbers of CD-SEM images are blurred or have some artefact and there is a need for image inspection along with the CD measurement. Tool may not report a practical metric highlighting the quality of image. Not filtering CD from these blurred images will add metrology noise to the CD measurement. An image classifier can be helpful here for filtering such data. This paper presents the use of artificial intelligence in classifying the SEM images. Deep machine learning is used to train a neural network which is then used to classify the new images as blurred and not blurred. Figure 1 shows the image blur artefact and contingency table of classification results from the trained deep neural network. Prediction accuracy of 94.9 % was achieved in the first model. Paper covers other such applications of the deep neural network in image classification for inspection, review and metrology.

Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach

DOE Office of Scientific and Technical Information (OSTI.GOV)

Su P.; Kaznatcheev K.; Wang, Y.

In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision and accuracy better than 100 nrad (rms) and {approx}200 nrad (rms), respectively, with a lateral resolution of few mm or less. We present results of the calibration of the metrology systems, discuss their accuracy and address the precision in measuring amore » spherical mirror.« less

Joint Research on Scatterometry and AFM Wafer Metrology

NASA Astrophysics Data System (ADS)

Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

2011-11-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

Digital terrain modeling and industrial surface metrology: Converging realms

USGS Publications Warehouse

Pike, R.J.

2001-01-01

Digital terrain modeling has a micro-and nanoscale counterpart in surface metrology, the numerical characterization of industrial surfaces. Instrumentation in semiconductor manufacturing and other high-technology fields can now contour surface irregularities down to the atomic scale. Surface metrology has been revolutionized by its ability to manipulate square-grid height matrices that are analogous to the digital elevation models (DEMs) used in physical geography. Because the shaping of industrial surfaces is a spatial process, the same concepts of analytical cartography that represent ground-surface form in geography evolved independently in metrology: The surface topography of manufactured components, exemplified here by automobile-engine cylinders, is routinely modeled by variogram analysis, relief shading, and most other techniques of parameterization and visualization familiar to geography. This article introduces industrial surface-metrology, examines the field in the context of terrain modeling and geomorphology and notes their similarities and differences, and raises theoretical issues to be addressed in progressing toward a unified practice of surface morphometry.

Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

NASA Astrophysics Data System (ADS)

Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

2017-09-01

For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

NASA Astrophysics Data System (ADS)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Arpaia, P., E-mail: pasquale.arpaia@unina.it; Technology Department, European Organization for Nuclear Research; Girone, M., E-mail: mario.girone@cern.ch

2015-12-15

The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sourcesmore » most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.« less

Performance of ASML YieldStar μDBO overlay targets for advanced lithography nodes C028 and C014 overlay process control

NASA Astrophysics Data System (ADS)

Blancquaert, Yoann; Dezauzier, Christophe; Depre, Jerome; Miqyass, Mohamed; Beltman, Jan

2013-04-01

Continued tightening of overlay control budget in semiconductor lithography drives the need for improved metrology capabilities. Aggressive improvements are needed for overlay metrology speed, accuracy and precision. This paper is dealing with the on product metrology results of a scatterometry based platform showing excellent production results on resolution, precision, and tool matching for overlay. We will demonstrate point to point matching between tool generations as well as between target sizes and types. Nowadays, for the advanced process nodes a lot of information is needed (Higher order process correction, Reticle fingerprint, wafer edge effects) to quantify process overlay. For that purpose various overlay sampling schemes are evaluated: ultra- dense, dense and production type. We will show DBO results from multiple target type and shape for on product overlay control for current and future node down to at least 14 nm node. As overlay requirements drive metrology needs, we will evaluate if the new metrology platform meets the overlay requirements.

Research on Electrically Driven Single Photon Emitter by Diamond for Quantum Cryptography

DTIC Science & Technology

2015-03-24

by diamond for quantum cryptography 5a. CONTRACT NUMBER FA2386-14-1-4037 5b. GRANT NUMBE R Grant 14IOA093_144037 5c. PROGRAM ELEMENT...emerged as a highly competitive platform for applications in quantum cryptography , quantum computing, spintronics, and sensing or metrology...15. SUBJECT TERMS Diamond LED, Nitrogen Vacancy Complex, Quantum Computing, Quantum Cryptography , Single Spin Single Photon 16. SECURITY

JPRS Report, Science & Technology, USSR: Science & Technology Policy..

DTIC Science & Technology

1987-11-13

is necessary to have for comparison a gauge —"how much he should have done." How to surmount these difficulties is a theme for a separate study. Here...undergo in the shop complete machining, including the milling of complex surfaces, the boring of sockets, grooving, the drilling of holes, including deep...particularly machine building products. Thus, the sectorial ministries are implementing programs of the complete standardization and metrological

Intranet and Internet metrological workstation with photonic sensors and transmission

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.; Pozniak, Krzysztof T.; Dybko, Artur

1999-05-01

We describe in this paper a part of a telemetric network which consists of a workstation with photonic measurement and communication interfaces, structural fiber optic cabling (10/100BaseFX and CAN-FL), and photonic sensors with fiber optic interfaces. The station is equipped with direct photonic measurement interface and most common measuring standards converter (RS, GPIB) with fiber optic I/O CAN bus, O/E converters, LAN and modem ports. The station was connected to the Intranet (ipx/spx) and Internet (tcp/ip) with separate IP number and DNS, WINS names. Virtual measuring environment system program was written specially for such an Intranet and Internet station. The measurement system program communicated with the user via a Graphical User's Interface (GUI). The user has direct access to all functions of the measuring station system through appropriate layers of GUI: telemetric, transmission, visualization, processing, information, help and steering of the measuring system. We have carried out series of thorough simulation investigations and tests of the station using WWW subsystem of the Internet. We logged into the system through the LAN and via modem. The Internet metrological station works continuously under the address http://nms.ipe.pw.edu.pl/nms. The station and the system hear the short name NMS (from Network Measuring System).

In-field Raman amplification on coherent optical fiber links for frequency metrology.

PubMed

Clivati, C; Bolognini, G; Calonico, D; Faralli, S; Mura, A; Levi, F

2015-04-20

Distributed Raman amplification (DRA) is widely exploited for the transmission of broadband, modulated signals used in data links, but not yet in coherent optical links for frequency metrology, where the requirements are rather different. After preliminary tests on fiber spools, in this paper we deeper investigate Raman amplification on deployed in-field optical metrological links. We actually test a Doppler-stabilized optical link both on a 94 km-long metro-network implementation with multiplexed ITU data channels and on a 180 km-long dedicated fiber haul connecting two cities, where DRA is employed in combination with Erbium-doped fiber amplification (EDFA). The performance of DRA is detailed in both experiments, indicating that it does not introduce noticeable penalties for the metrological signal or for the ITU data channels. We hence show that Raman amplification of metrological signals can be compatible with a wavelength division multiplexing architecture and that it can be used as an alternative or in combination with dedicated bidirectional EDFAs. No deterioration is noticed in the coherence properties of the delivered signal, which attains frequency instability at the 10(-19) level in both cases. This study can be of interest also in view of the undergoing deployment of continental fiber networks for frequency metrology.

CSAM Metrology Software Tool

NASA Technical Reports Server (NTRS)

Vu, Duc; Sandor, Michael; Agarwal, Shri

2005-01-01

CSAM Metrology Software Tool (CMeST) is a computer program for analysis of false-color CSAM images of plastic-encapsulated microcircuits. (CSAM signifies C-mode scanning acoustic microscopy.) The colors in the images indicate areas of delamination within the plastic packages. Heretofore, the images have been interpreted by human examiners. Hence, interpretations have not been entirely consistent and objective. CMeST processes the color information in image-data files to detect areas of delamination without incurring inconsistencies of subjective judgement. CMeST can be used to create a database of baseline images of packages acquired at given times for comparison with images of the same packages acquired at later times. Any area within an image can be selected for analysis, which can include examination of different delamination types by location. CMeST can also be used to perform statistical analyses of image data. Results of analyses are available in a spreadsheet format for further processing. The results can be exported to any data-base-processing software.

NASA Tech Briefs, July 2005

NASA Technical Reports Server (NTRS)

2005-01-01

Thin-Film Resistance Heat-Flux Sensors Circuit Indicates that Voice-Recording Disks are Nearly Full Optical Sensing of Combustion Instabilities in Gas Turbines Topics include: Crane-Load Contact Sensor; Hexagonal and Pentagonal Fractal Multiband Antennas; Multifunctional Logic Gate Controlled by Temperature; Multifunctional Logic Gate Controlled by Supply Voltage; Power Divider for Waveforms Rich in Harmonics; SCB Quantum Computers Using iSWAP and 1-Qubit Rotations; CSAM Metrology Software Tool; Update on Rover Sequencing and Visualization Program; Selecting Data from a Star Catalog; Rotating Desk for Collaboration by Two Computer Programmers; Variable-Pressure Washer; Magnetically Attached Multifunction Maintenance Rover; Improvements in Fabrication of Sand/Binder Cores for Casting; Solid Freeform Fabrication of Composite-Material Objects; Efficient Computational Model of Hysteresis; Gauges for Highly Precise Metrology of a Compound Mirror; Improved Electrolytic Hydrogen Peroxide Generator; High-Power Fiber Lasers Using Photonic Band Gap Materials; Ontology-Driven Information Integration; Quantifying Traversability of Terrain for a Mobile Robot; More About Arc-Welding Process for Making Carbon Nanotubes; Controlling Laser Spot Size in Outer Space; or Software-Reconfigurable Processors for Spacecraft.

Trapped atomic ions for quantum-limited metrology

NASA Astrophysics Data System (ADS)

Wineland, David

2017-04-01

Laser-beam-manipulated trapped ions are a candidate for large-scale quantum information processing and quantum simulation but the basic techniques used can also be applied to quantum-limited metrology and sensing. Some examples being explored at NIST are: 1) As charged harmonic oscillators, trapped ions can be used to sense electric fields; this can be used to characterize the electrode-surface-based noisy electric fields that compromise logic-gate fidelities and may eventually be used as a tool in surface science. 2) Since typical qubit logic gates depend on state-dependent forces, we can adapt the gate dynamics to sensitively detect additional forces. 3) We can use extensions of Bell inequality measurements to further restrict the degree of local realism possessed by Bell states. 4) We also briefly describe experiments for creation of Bell states using Hilbert space engineering. This work is a joint effort including the Ion-Storage group, the Quantum processing group, and the Computing and Communications Theory group at NIST, Boulder. Supported by IARPA, ONR, and the NIST Quantum Information Program.

Standardisation of the (129)I, (151)Sm and (166m)Ho activity concentration using the CIEMAT/NIST efficiency tracing method.

PubMed

Altzitzoglou, Timotheos; Rožkov, Andrej

2016-03-01

The (129)I, (151)Sm and (166m)Ho standardisations using the CIEMAT/NIST efficiency tracing method, that have been carried out in the frame of the European Metrology Research Program project "Metrology for Radioactive Waste Management" are described. The radionuclide beta counting efficiencies were calculated using two computer codes CN2005 and MICELLE2. The sensitivity analysis of the code input parameters (ionization quenching factor, beta shape factor) on the calculated efficiencies was performed, and the results are discussed. The combined relative standard uncertainty of the standardisations of the (129)I, (151)Sm and (166m)Ho solutions were 0.4%, 0.5% and 0.4%, respectively. The stated precision obtained using the CIEMAT/NIST method is better than that previously reported in the literature obtained by the TDCR ((129)I), the 4πγ-NaI ((166m)Ho) counting or the CIEMAT/NIST method ((151)Sm). Copyright © 2015 The Authors. Published by Elsevier Ltd.. All rights reserved.

Metrology - Beyond the Calibration Lab

NASA Technical Reports Server (NTRS)

Mimbs, Scott M.

2008-01-01

We rely on data from measurements every day; a gas-pump, a speedometer, and a supermarket weight scale are just three examples of measurements we use to make decisions. We generally accept the data from these measurements as "valid." One reason we can accept the data is the "legal metrology" requirements established and regulated by the government in matters of commerce. The measurement data used by NASA, other government agencies, and industry can be critical to decisions which affect everything from economic viability, to mission success, to the security of the nation. Measurement data can even affect life and death decisions. Metrology requirements must adequately provide for risks associated with these decisions. To do this, metrology must be integrated into all aspects of an industry including research, design, testing, and product acceptance. Metrology, the science of measurement, has traditionally focused on the calibration of instruments, and although instrument calibration is vital, it is only a part of the process that assures quality in measurement data. For example, measurements made in research can influence the fundamental premises that establish the design parameters, which then flow down to the manufacturing processes, and eventually impact the final product. Because a breakdown can occur anywhere within this cycle, measurement quality assurance has to be integrated into every part of the life-cycle process starting with the basic research and ending with the final product inspection process. The purpose of this paper is to discuss the role of metrology in the various phases of a product's life-cycle. For simplicity, the cycle will be divided in four broad phases, with discussions centering on metrology within NASA. .

Coherent double-color interference microscope for traceable optical surface metrology

NASA Astrophysics Data System (ADS)

Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

2016-06-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Settens, Charles M.

2015-01-01

Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron criticalmore » dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.« less

Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

DOE Office of Scientific and Technical Information (OSTI.GOV)

Foucher, J.; Faurie, P.; Dourthe, L.

2011-11-10

The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R and D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials...). Therefore, time for R and D ismore » increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam.In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R and D and production. The final goal for 'chip makers' is to improve yield and save R and D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2{sup nd} part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.« less

Optical metrology at the Optical Sciences Center: an historical review

NASA Astrophysics Data System (ADS)

Creath, Katherine; Parks, Robert E.

2014-10-01

The Optical Sciences Center (OSC) begun as a graduate-level applied optics teaching institution to support the US space effort. The making of optics representative of those used in other space programs was deemed essential. This led to the need for optical metrology: at first Hartmann tests, but almost immediately to interferometric tests using the newly invented HeNe laser. Not only were new types of interferometers needed, but the whole infrastructure that went with testing, fringe location methods, aberration removal software and contour map generation to aid the opticians during polishing needed to be developed. Over the last half century more rapid and precise methods of interferogram data reduction, surface roughness measurement, and methods of instrument calibration to separate errors from those in the optic have been pioneered at OSC. Other areas of research included null lens design and the writing of lens design software that led into the design of computer generated holograms for asphere testing. More recently work has been done on the reduction of speckle noise in interferograms, methods to test large convex aspheres, and a return to slope measuring tests to increase the dynamic range of the types of aspheric surfaces amenable to optical testing including free-form surfaces. This paper documents the history of the development of optical testing projects at OSC and highlights the contributions some of the individuals associated with new methods of testing and the infrastructure needed to support the testing. We conclude with comments about the future trends optical metrology.

Two Approaches to Calibration in Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Campanelli, Mark

2014-04-01

Inferring mathematical relationships with quantified uncertainty from measurement data is common to computational science and metrology. Sufficient knowledge of measurement process noise enables Bayesian inference. Otherwise, an alternative approach is required, here termed compartmentalized inference, because collection of uncertain data and model inference occur independently. Bayesian parameterized model inference is compared to a Bayesian-compatible compartmentalized approach for ISO-GUM compliant calibration problems in renewable energy metrology. In either approach, model evidence can help reduce model discrepancy.

Dynamic metrology and data processing for precision freeform optics fabrication and testing

NASA Astrophysics Data System (ADS)

Aftab, Maham; Trumper, Isaac; Huang, Lei; Choi, Heejoo; Zhao, Wenchuan; Graves, Logan; Oh, Chang Jin; Kim, Dae Wook

2017-06-01

Dynamic metrology holds the key to overcoming several challenging limitations of conventional optical metrology, especially with regards to precision freeform optical elements. We present two dynamic metrology systems: 1) adaptive interferometric null testing; and 2) instantaneous phase shifting deflectometry, along with an overview of a gradient data processing and surface reconstruction technique. The adaptive null testing method, utilizing a deformable mirror, adopts a stochastic parallel gradient descent search algorithm in order to dynamically create a null testing condition for unknown freeform optics. The single-shot deflectometry system implemented on an iPhone uses a multiplexed display pattern to enable dynamic measurements of time-varying optical components or optics in vibration. Experimental data, measurement accuracy / precision, and data processing algorithms are discussed.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

NASA Astrophysics Data System (ADS)

Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

2015-03-01

While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

Effect of metrology time delay on overlay APC

NASA Astrophysics Data System (ADS)

Carlson, Alan; DiBiase, Debra

2002-07-01

The run-to-run control strategy of lithography APC is primarily composed of a feedback loop as shown in the diagram below. It is known that the insertion of a time delay in a feedback loop can cause degradation in control performance and could even cause a stable system to become unstable, if the time delay becomes sufficiently large. Many proponents of integrated metrology methods have cited the damage caused by metrology time delays as the primary justification for moving from a stand-alone to integrated metrology. While there is little dispute over the qualitative form of this argument, there has been very light published about the quantitative effects under real fab conditions - precisely how much control is lost due to these time delays. Another issue regarding time delays is that the length of these delays is not typically fixed - they vary from lot to lot and in some cases this variance can be large - from one hour on the short side to over 32 hours on the long side. Concern has been expressed that the variability in metrology time delays can cause undesirable dynamics in feedback loops that make it difficult to optimize feedback filters and gains and at worst could drive a system unstable. By using data from numerous fabs, spanning many sizes and styles of operation, we have conducted a quantitative study of the time delay effect on overlay run- to-run control. Our analysis resulted in the following conclusions: (1) There is a significant and material relationship between metrology time delay and overlay control under a variety of real world production conditions. (2) The run-to-run controller can be configured to minimize sensitivity to time delay variations. (3) The value of moving to integrated metrology can be quantified.

Absolute metrology for space interferometers

NASA Astrophysics Data System (ADS)

Salvadé, Yves; Courteville, Alain; Dändliker, René

2017-11-01

The crucial issue of space-based interferometers is the laser interferometric metrology systems to monitor with very high accuracy optical path differences. Although classical high-resolution laser interferometers using a single wavelength are well developed, this type of incremental interferometer has a severe drawback: any interruption of the interferometer signal results in the loss of the zero reference, which requires a new calibration, starting at zero optical path difference. We propose in this paper an absolute metrology system based on multiplewavelength interferometry.

Metrology Laboratory | Energy Systems Integration Facility | NREL

Science.gov Websites

and artificial) Spectral reflectance and transmission of materials (functional check only , pyrheliometers,* pyranometers,* and pyrgeometers. The Metrology Laboratory provides National Institute of

Coordinate metrology of a primary surface composite panel from the Large Millimeter Telescope

NASA Astrophysics Data System (ADS)

Gale, David M.; Lucero Álvarez, Maribel; Cabrera Cuevas, Lizeth; Leon-Huerta, Andrea; Arizmendi Reyes, Edgar; Icasio Hernández, Octavio; Castro Santos, David; Hernández Ríos, Emilio; Tecuapetla Sosa, Esteban; Tzile Torres, Carlos; Viliesid Alonso, Miguel

2016-07-01

The Large Millimeter Telescope (LMT) is a single-dish fully-steerable radio telescope presently operating with a 32.5 m parabolic primary reflector, in the process of extension to 50 m. The project is managed by the Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE) in México, and the University of Massachusetts Amherst, USA. A laminated surface panel from the LMT primary reflector has been subjected to a surface measurement assay at Mexico's National Metrology Center (CENAM). Data obtained using a coordinate measuring machine and laser tracker owned by CENAM is compared with measurements using an identical model laser tracker and the photogrammetry technique, the latter systems owned and operated by the LMT. All measurements were performed within the controlled metrology environment at CENAM. The measurement exercise is intended to prepare the groundwork for converting this spare surface panel into a calibrated work-piece. The establishment of a calibrated work-piece provides quality assurance for metrology through measurement traceability. It also simplifies the evaluation of measurement uncertainty for coordinate metrology procedures used by the LMT project during reflector surface qualification.

The role of metrology in mediating and mobilizing the language and culture of scientific facts

NASA Astrophysics Data System (ADS)

Fisher, W. P., Jr.; Stenner, A. J.

2015-02-01

The self-conscious awareness of language and its use is arguably nowhere more intense than in metrology. The careful and deliberate coordination and alignment of shared metrological frames of reference for theory, experiment, and practical application have been characteristics of scientific culture at least since the origins of the SI units in revolutionary France. Though close attention has been focused on the logical and analytical aspects of language use in science, little concern has been shown for understanding how the social and historical aspects of everyday language may have foreshadowed and influenced the development and character of metrological language, especially relative to the inevitably partial knowledge possessed by any given stakeholder participating in the scientific enterprise. Insight in this regard may be helpful in discerning how and if an analogous role for metrology might be created in psychology and the social sciences. It may be that the success of psychology as a science will depend less on taking physics as the relevant model than on attending to the interplay of concepts, models, and social organization that make any culture effective.

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk

2016-05-15

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicabilitymore » in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.« less

Progress of Multi-Beam Long Trace-Profiler Development

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Kilaru, Kiranmayee; Merthe, Daniel J.; Kester, Thomas; McKinney, Wayne R.; Takacs, Peter Z.; Yashchuk, Valeriy V.

2012-01-01

The multi-beam long trace profiler (LTP) under development at NASA s Marshall Space Flight Center[1] is designed to increase the efficiency of metrology of replicated X-ray optics. The traditional LTP operates on a single laser beam that scans along the test surface to detect the slope errors. While capable of exceptional surface slope accuracy, the LTP single beam scanning has slow measuring speed. As metrology constitutes a significant fraction of the time spent in optics production, an increase in the efficiency of metrology helps in decreasing the cost of fabrication of the x-ray optics and in improving their quality. Metrology efficiency can be increased by replacing the single laser beam with multiple beams that can scan a section of the test surface at a single instance. The increase in speed with such a system would be almost proportional to the number of laser beams. A collaborative feasibility study has been made and specifications were fixed for a multi-beam long trace profiler. The progress made in the development of this metrology system is presented.

Geometric errors in 3D optical metrology systems

NASA Astrophysics Data System (ADS)

Harding, Kevin; Nafis, Chris

2008-08-01

The field of 3D optical metrology has seen significant growth in the commercial market in recent years. The methods of using structured light to obtain 3D range data is well documented in the literature, and continues to be an area of development in universities. However, the step between getting 3D data, and getting geometrically correct 3D data that can be used for metrology is not nearly as well developed. Mechanical metrology systems such as CMMs have long established standard means of verifying the geometric accuracies of their systems. Both local and volumentric measurments are characterized on such system using tooling balls, grid plates, and ball bars. This paper will explore the tools needed to characterize and calibrate an optical metrology system, and discuss the nature of the geometric errors often found in such systems, and suggest what may be a viable standard method of doing characterization of 3D optical systems. Finally, we will present a tradeoff analysis of ways to correct geometric errors in an optical systems considering what can be gained by hardware methods versus software corrections.

Optical Metrology for the Segmented Optics on the Constellation-X Spectroscopy X-Ray Telescope

NASA Technical Reports Server (NTRS)

Content, David; Colella, David; Fleetwood, Charles; Hadjimichael, Theo; Lehan, John; McMann, Joseph; Reid, Paul; Saha, Timo; Wright, Geraldine; Zhang, William

2004-01-01

We present the metrology requirements and metrology implementation necessary to prove out the reflector technology for the Constellation X(C-X) spectroscopy X-ray telescope (SXT). This segmented, 1.6m diameter highly nested Wolter-1 telescope presents many metrology and alignment challenges. In particular, these mirrors have a stringent imaging error budget as compared to their intrinsic stiffness; This is required for Constellation-X to have sufficient effective area with the weight requirement. This has implications for the metrology that can be used. A variety of contract and noncontact optical profiling and interferometric methods are combined to test the formed glass substrates before replication and the replicated reflector segments.The reflectors are tested both stand-alone and in-situ in an alignment tower.Some of these methods have not been used on prior X-ray telescopes and some are feasible only because of the segmented approach used on the SXT. Methods discussed include high precision coordinate measurement machines using very low force or optical probe axial interferometric profiling azimuthal circularity profiling and use of advanced null optics such as conical computer generated hologram (CGHs).

Theoferometer for the Construction of Precision Optomechanical Assemblies

NASA Technical Reports Server (NTRS)

Korzun, Ashley M.

2006-01-01

The increasing difficulty of metrology requirements on projects involving optics and the alignment of instrumentation on spacecraft has reached a turning point. Requirements as low as 0.1 arcseconds for the static, rotational alignment of components within a coordinate system cannot be met with a theodolite, the alignment tool currently in use. A "theoferometer" is an interferometer mounted on a rotation stage with degrees of freedom in azimuth and elevation for metrology and alignment applications. The success of a prototype theoferometer in approaching these metrology requirements led to a redesign stressing mechanical, optical, and software changes to increase the sensitivity and portability of the unit. This paper covers the improvements made to the first prototype theoferometer, characteristic testing, and demonstration of the redesigned theoferometer s capabilities as a "theodolite replacement" and low-uncertainty metrology tool.

Recent progress in understanding the imaging and metrology using the helium ion microscope

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladar, Andras E.; Ming, Bin

2009-05-01

Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of these barriers. A new tool for imaging and metrology for nanotechnology is the scanning Helium Ion Microscope (HIM). The HIM is a new approach to imaging and metrology for nanotechnology which may be able to push this barrier lower. As a new methodology, it is just beginning to show promise and the number of potentially advantageous applications for nanotechnology and nanometrology has yet to be fully exploited. This presentation will discuss some of the progress made at NIST in collaboration with the manufacturing community in understanding the imaging and metrology for this new technology.

Earthquakes and sea level - Space and terrestrial metrology on a changing planet

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bilham, R.

1991-02-01

A review is presented of the stability and scale of crustal deformation metrology which has particular relevance to monitoring deformation associated with sea level and earthquakes. Developments in space geodesy and crustal deformation metrology in the last two decades have the potential to acquire a homogeneous global data set for monitoring relative horizontal and vertical motions of the earth's surface to within several millimeters. New tools discussed for forecasting sea level rise and damaging earthquakes include: very long baseline interferometry, satellite laser ranging, the principles of GPS geodesy, and new sea level sensors. Space geodesy permits a unified global basismore » for future metrology of the earth, and the continued availability of the GPS is currently fundamental to this unification.« less

Integration of mask and silicon metrology in DFM

NASA Astrophysics Data System (ADS)

Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

2009-03-01

We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based on the profiling method of the field proven CD metrology algorithm. The detected edges are then converted to GDSII format, which is a standard format for a design data, and utilized for various DFM systems such as simulation. Namely, by integrating pattern shapes of mask and silicon formed during a manufacturing process into GDSII format, it makes it possible to bridge highly accurate pattern profile information over to the design field of various EDA systems. These are fully integrated into design data and automated. Bi-directional cross probing between mask data and process control data is allowed by linking them. This method is a solution for total optimization that covers Design, MDP, mask production and silicon device producing. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

Enabling CD SEM metrology for 5nm technology node and beyond

NASA Astrophysics Data System (ADS)

Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

2017-03-01

The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with the requirements of the future technology nodes. The root causes of these challenges are not uniquely related to the shrinking CD values, as one might expect, but to the increase in complexity of the devices in terms of morphology and chemical composition as well. In fact, complicated threedimensional device architectures, high aspect ratio features, and wide variety of materials are some of the unavoidable characteristics of the future metrology nodes. This means that, beside an improvement in resolution, it is critical to develop a CD SEM metrology capable of satisfying the specific needs of the devices of the nodes to come, needs that sometimes will have to be addressed through dramatic changes in approach with respect to traditional CD SEM metrology. In this paper, we report on the development of advanced CD SEM metrology at imec on a variety of device platform and processes, for both logic and memories. We discuss newly developed approaches for standard, IIIV, and germanium FinFETs (Fin Field Effect Transistors), for lateral and vertical nanowires (NW), 3D NAND (three-dimensional NAND), STT-MRAM (Spin Transfer Magnetic Torque Random-Access Memory), and ReRAM (Resistive Random Access Memory). Applications for both front-end of line (FEOL) and back-end of line (BEOL) are developed. In terms of process, S/D Epi (Source Drain Epitaxy), SAQP (Self-Aligned Quadruple Patterning), DSA (Dynamic Self-Assembly), and EUVL (Extreme Ultraviolet Lithography) have been used. The work reported here has been performed on Hitachi CG5000, CG6300, and CV5000. In terms of logic, we discuss here the S/D epi defect classification, the metrology optimization for STI (Shallow Trench Isolation) Ge FinFETs, the defectivity of III-V STI FinFETs,, metrology for vertical and horizontal NWs. With respect to memory, we discuss a STT-RAM statistical CD analysis and its comparison to electrical performance, ReRAM metrology for VMCO (Vacancy-modulated conductive oxide) with comparison with electrical performance, 3D NAND ONO (Oxide Nitride Oxide) thickness measurements. In addition, we report on 3D morphological reconstruction using CD SEM in conjunction with FIB (Focused Ion Beam), on optimized BKM (Best Known Methods) development methodologies, and on CD SEM overlay. The large variety of results reported here gives a clear overview of the creative effort put in place to ensure that the critical potential of CD SEM metrology tools is fully enabled for the 5nm node and beyond.

Solar Radiation Research Laboratory | Energy Systems Integration Facility |

Science.gov Websites

radiation components, and has expanded its expertise to include integrated metrology, optics, electronics Acquisition Laboratory, Metrology Laboratory, Optics Laboratory, and Electronics Laboratory. Photo of a

Consultative Committee on Ionizing Radiation: Impact on Radionuclide Metrology

PubMed Central

Karam, L.R.; Ratel, G.

2016-01-01

In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM’s consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. PMID:26688351

Vacuum Technology Considerations For Mass Metrology

PubMed Central

Abbott, Patrick J.; Jabour, Zeina J.

2011-01-01

Vacuum weighing of mass artifacts eliminates the necessity of air buoyancy correction and its contribution to the measurement uncertainty. Vacuum weighing is also an important process in the experiments currently underway for the redefinition of the SI mass unit, the kilogram. Creating the optimum vacuum environment for mass metrology requires careful design and selection of construction materials, plumbing components, pumping, and pressure gauging technologies. We review the vacuum technology1 required for mass metrology and suggest procedures and hardware for successful and reproducible operation. PMID:26989593

Application of Ionic Liquids in Amperometric Gas Sensors.

PubMed

Gębicki, Jacek; Kloskowski, Adam; Chrzanowski, Wojciech; Stepnowski, Piotr; Namiesnik, Jacek

2016-01-01

This article presents an analysis of available literature data on metrological parameters of the amperometric gas sensors containing ionic liquids as an electrolyte. Four mechanism types of signal generation in amperometric sensors with ionic liquid are described. Moreover, this article describes the influence of selected physico-chemical properties of the ionic liquids on the metrological parameters of these sensors. Some metrological parameters are also compared for amperometric sensors with GDE and SPE electrodes and with ionic liquids for selected analytes.

The Opportunities and Challenges of Bringing New Metrology Equipment to Market

NASA Astrophysics Data System (ADS)

Perloff, David S.

2005-09-01

This paper provides an overview of the economic and technological factors which are driving the demand for new metrology and inspection equipment, the challenges and opportunities facing new companies in bringing such equipment to market, and the funding environment in which new companies must raise capital to finance their efforts. Seven metrology companies and one inspection equipment company that have received first-time venture backing since 2000 are used to illustrate how these specialized businesses are launched and funded.

A new approach to pattern metrology

NASA Astrophysics Data System (ADS)

Ausschnitt, Christopher P.

2004-05-01

We describe an approach to pattern metrology that enables the simultaneous determination of critical dimensions, overlay and film thickness. A single optical system captures nonzero- and zero-order diffracted signals from illuminated grating targets, as well as unpatterned regions of the surrounding substrate. Differential targets provide in situ dimensional calibration. CD target signals are analyzed to determine average dimension, profile attributes, and effective dose and defocus. In turn, effective dose and defocus determines all CDs pre-correlated to the dose and focus settings of the exposure tool. Overlay target signals are analyzed to determine the relative reflectivity of the layer pair and the overlay error between them. Compared to commercially available pattern metrology (SEM, optical microscopy, AFM, scatterometry and schnitzlometry), our approach promises improved signal-to-noise, higher throughput and smaller targets. We have dubbed this optical chimera MOXIE (Metrology Of eXtremely Irrational Exuberance).

1.5 nm fabrication of test patterns for characterization of metrological systems

DOE PAGES

Babin, Sergey; Calafiore, Giuseppe; Peroz, Christophe; ...

2015-11-06

Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, eachmore » according to its designed width. As a result, the fabricated test samples were imaged using a transmission electron microscope, a scanning electron microscope, and an atomic force microscope. (C) 2015 American Vacuum Society.« less

Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

NASA Astrophysics Data System (ADS)

Pendrill, L. R.; Fisher, William P., Jr.

2013-09-01

A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity.

Influence of the air’s refractive index on precision angle metrology with autocollimators

NASA Astrophysics Data System (ADS)

Geckeler, Ralf D.; Křen, Petr; Just, Andreas; Schumann, Matthias; Krause, Michael

2018-07-01

In this paper, we discuss a substantial—though previously neglected—error source in precision metrology with autocollimators, specifically, changes in the air’s refractive index, with a focus on the dominant impact of pressure changes. Pressure decreases with increasing elevation above sea level and is subject to substantial variation due to weather changes. It causes changes in an autocollimator’s angle response which are proportional to the measured angle and which increase linearly with the beam length and air pressure. We characterise this important influence in detail by using extended theoretical and experimental investigations and derive strategies for correcting it. We discuss its implications for the comparison of autocollimator calibrations performed at different metrology institutes which is crucial for validating their calibration capabilities. This work aims at approaching fundamental limits in angle metrology with autocollimators.

Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

NASA Astrophysics Data System (ADS)

Upputuri, Paul Kumar; Pramanik, Manojit

2018-02-01

Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

High-volume manufacturing device overlay process control

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Lee, DongYoung; Song, ChangRock; Heo, Hoyoung; Brinster, Irina; Choi, DongSub; Robinson, John C.

2017-03-01

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay metrology is performed on metrology targets on a high frequency basis including every lot (or most lots) at DI. SEM based FI metrology is performed ondevice in-die as-etched on an infrequent basis. Hybrid control schemes of this type have been in use for many process nodes. What is new is the relative size of the NZO as compared to the overlay spec, and the need to find more comprehensive solutions to characterize and control the size and variability of NZO at the 1x nm node: sampling, modeling, temporal frequency and control aspects, as well as trade-offs between SEM throughput and accuracy.

Confocal Microscopy

NASA Astrophysics Data System (ADS)

Liu, Jian; Tan, Jiubin

2016-12-01

The confocal microscope is appropriate for imaging cells or the measurement of industrial artefacts. However, junior researchers and instrument users sometimes misuse imaging concepts and metrological characteristics, such as position resolution in industrial metrology and scale resolution in bio-imaging. And, metrological characteristics or influence factors in 3D measurement such as height assessment error caused by 3D coupling effect are so far not yet identified. In this book, the authors outline their practices by the working experiences on standardization and system design. This book assumes little previous knowledge of optics, but rich experience in engineering of industrial measurements, in particular with profile metrology or areal surface topography will be very helpful to understand the theoretical concerns and value of the technological advances. It should be useful for graduate students or researchers as extended reading material, as well as microscope users alongside their handbook.

DLP-based 3D metrology by structured light or projected fringe technology for life sciences and industrial metrology

NASA Astrophysics Data System (ADS)

Frankowski, G.; Hainich, R.

2009-02-01

Since the mid-eighties, a fundamental idea for achieving measuring accuracy in projected fringe technology was to consider the projected fringe pattern as an interferogram and evaluate it on the basis of advanced algorithms widely used for phase measuring in real-time interferometry. A fundamental requirement for obtaining a sufficiently high degree of measuring accuracy with this so-called "phase measuring projected fringe technology" is that the projected fringes, analogous to interference fringes, must have a cos2-shaped intensity distribution. Until the mid-nineties, this requirement for the projected fringe pattern measurement technology presented a basic handicap for its wide application in 3D metrology. This situation changed abruptly, when in the nineties Texas Instruments introduced to the market advanced digital light projection on the basis of micro mirror based projection systems, socalled DLP technology, which also facilitated the generation and projection of cos2-shaped intensity and/or fringe patterns. With this DLP technology, which from its original approach was actually oriented towards completely different applications such as multimedia projection, Texas Instruments boosted phase-measuring fringe projection in optical 3D metrology to a worldwide breakthrough both for medical as well as industrial applications. A subject matter of the lecture will be to present the fundamental principles and the resulting advantages of optical 3D metrology based on phase-measuring fringe projection using DLP technology. Further will be presented and discussed applications of the measurement technology in medical engineering and industrial metrology.

[The EFS metrology: From the production to the reason].

PubMed

Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

2014-06-01

In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

Flight programs and X-ray optics development at MSFC

NASA Astrophysics Data System (ADS)

Gubarev, M.; Ramsey, B.; O'Dell, S.; Elsner, R.; Kilaru, K.; Atkins, C.; Swartz, D.; Gaskin, J.; Weisskopf, M.

The X-ray astronomy group at the Marshall Space Flight Center (MSFC) is developing electroformed nickel/cobalt x-ray optics for suborbital and orbital experiments. Suborbital instruments include the Focusing X-ray Solar Imager (FOXSI) and Micro-X sounding rocket experiments and the HEROES balloon payload. Our current orbital program is the fabrication of mirror modules for the Astronomical Roentgen Telescope (ART) to be launched on board the Russian-German Spectrum Roentgen Gamma Mission (SRG). A second component of our work is the development of fabrication techniques and optical metrology to improve the angular resolution of thin-shell optics to the arcsecond-level.

A solar diameter metrology measurement: the Picard microsatellite program

NASA Astrophysics Data System (ADS)

Damé, Luc; Brun, Jean-Francis; Cugnet, David; Derrien, Marc; Leroy, Claude; Meftah, Mustapha; Meissonnier, Mireille; Porteneuve, Jacques

2017-11-01

The PICARD microsatellite mission will provide 3 to 4 years simultaneous measurements of the solar diameter, differential rotation and solar constant to investigate the nature of their relations and variabilities. The major instrument, SODISM, is a whole Sun imaging telescope of Ø110 mm which will deliver an absolute measure (better than 4 mas) of the solar diameter and solar shape. Now in Phase B, PICARD is expected to be launched by 2005. We recall the scientific goals linked to the diameter measurement with interest for Earth Climate, Space Weather and Helioseismology, present the instrument optical concept and design, and give a brief overview of the program aspects.

Femtosecond pulses for medicine and production technology: overview of a German national project

NASA Astrophysics Data System (ADS)

Dausinger, Friedrich

2002-02-01

With the beginning of the new century the German federal government started the funding of a program intended to exploit the potential of femtosecond technology. In a foregoing competition, five research consortia had been successful and have started their investigations in the following fields. - micro-machining of technical materials for microstructure and drilling - medical therapy in : ophthalmology, dentistry, neurology and ear surgery - metrology - laser safety. Lasers, systems and technologies required in these potential fields of applications will be investigated. The program aims at industrial success and is dominated by industrial partners, therefore. The more fundamental research is done in university institutes and research centers.

First report on a European round robin for slope measuring profilers

NASA Astrophysics Data System (ADS)

Rommeveaux, Amparo; Thomasset, Muriel; Cocco, Daniele; Siewert, Frank

2005-08-01

In the framework of the European COoperation in the field of Scientific and Technical research action on "X-ray and Neutron Optic" (COST P7) and following the decision announced in the last International Workshop on Metrology for X-ray and neutron optic (Grenoble, April 2004), the metrology facilities of four European synchrotrons, Bessy, Elettra, ESRF and Soleil, have decided and started a program of instrument inter-comparison. Other synchrotrons are joining us and further interested Institutions are invited to participate in this open measurement comparison. The metrology instruments involved are different kinds of direct slope measurement devices, like the well known Long Trace Profiler (in house made or modified) and the Bessy N.O.M.. The Round Robin was started with 2 flat and 2 spherical mirrors (three made of Zerodur and one of fused silica) made available by Bessy and Elettra. A short radius of curvature spherical mirror of Silicon from SOLEIL was later added. First results show a very close match between the measurements of all facilities provided that the same procedures are followed. In particular, a special attention has to be given to the way of supporting the reference objects, as it will be illustrated by some examples. Another important issue is the characterization of the systematic errors of the different instruments and how they can be reduced or eliminated. The paper expects to open a discussion on the performances of different commercial and custom made or modified profilometers, and over standard procedures for calibration testing, including the definition of standard reference surfaces.

Forensic-metrological considerations on assessment of compliance (or non-compliance) in forensic blood alcohol content determinations: A case study with software application.

PubMed

Zamengo, Luca; Frison, Giampietro; Tedeschi, Gianpaola; Frasson, Samuela

2016-08-01

Blood alcohol concentration is the most frequent analytical determination carried out in forensic toxicology laboratories worldwide. It is usually required to assess if an offence has been committed by comparing blood alcohol levels with specified legal limits, which can vary widely among countries. Due to possible serious legal consequences associated with non-compliant alcohol levels, measurement uncertainty should be carefully evaluated, along with other metrological aspects which can influence the final result. The whole procedure can be time-consuming and error-generating in routine practice, increasing the risks for unreliable assessments. A software application named Ethanol WorkBook (EtWB) was developed at the author's laboratory by using Visual Basic for Application language and MS Excel(®), with the aim of providing help to forensic analysts involved in blood alcohol determinations. The program can (i) calculate measurement uncertainties and decision limits with different methodologies; (ii) assess compliance to specification limits with a guard-band approach; (iii) manage quality control (QC) data and create control charts for QC samples; (iv) create control maps from real cases data archives; (v) provide laboratory reports with graphical outputs for elaborated data and (vi) create comprehensive searchable case archives. A typical example of drink driving case is presented and discussed to illustrate the importance of a metrological approach for reliable compliance assessment and to demonstrate software application in routine practice. The tool is made freely available to the scientific community at request. Copyright © 2016 Elsevier Ireland Ltd. All rights reserved.

Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

NASA Technical Reports Server (NTRS)

Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael;

Signal processing for order 10 PM accuracy displacement metrology in real-world scientific applications

NASA Astrophysics Data System (ADS)

Halverson, Peter G.; Loya, Frank M.

2017-11-01

Projects such as the Space Interferometry Mission (SIM) [1] and Terrestrial Planet Finder (TPF) [2] rely heavily on sub-nanometer accuracy metrology systems to define their optical paths and geometries. The James Web Space Telescope (JWST) is using this metrology in a cryogenic dilatometer for characterizing material properties (thermal expansion, creep) of optical materials. For all these projects, a key issue has been the reliability and stability of the electronics that convert displacement metrology signals into real-time distance determinations. A particular concern is the behavior of the electronics in situations where laser heterodyne signals are weak or noisy and subject to abrupt Doppler shifts due to vibrations or the slewing of motorized optics. A second concern is the long-term (hours to days) stability of the distance measurements under conditions of drifting laser power and ambient temperature. This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

On-orbit Metrology and Calibration Requirements for Space Station Activities Definition Study

NASA Technical Reports Server (NTRS)

Cotty, G. M.; Ranganathan, B. N.; Sorrell, A. L.

1989-01-01

The Space Station is the focal point for the commercial development of space. The long term routine operation of the Space Station and the conduct of future commercial activities suggests the need for in-space metrology capabilities analogous when possible to those on-Earth. The ability to perform periodic calibrations and measurements with proper traceability is imperative for the routine operation of the Space Station. An initial review, however, indicated a paucity of data related to metrology and calibration requirements for in-space operations. This condition probably exists because of the highly developmental aspect of space activities to date, their short duration, and nonroutine nature. The on-orbit metrology and calibration needs of the Space Station were examined and assessed. In order to achieve this goal, the following tasks were performed: an up-to-date literature review; identification of on-orbit calibration techniques; identification of sensor calibration requirements; identification of calibration equipment requirements; definition of traceability requirements; preparation of technology development plans; and preparation of the final report. Significant information and major highlights pertaining to each task is presented. In addition, some general (generic) conclusions/observations and recommendations that are pertinent to the overall in-space metrology and calibration activities are presented.

Developments in optical modeling methods for metrology

NASA Astrophysics Data System (ADS)

Davidson, Mark P.

1999-06-01

Despite the fact that in recent years the scanning electron microscope has come to dominate the linewidth measurement application for wafer manufacturing, there are still many applications for optical metrology and alignment. These include mask metrology, stepper alignment, and overlay metrology. Most advanced non-optical lithographic technologies are also considering using topics for alignment. In addition, there have been a number of in-situ technologies proposed which use optical measurements to control one aspect or another of the semiconductor process. So optics is definitely not dying out in the semiconductor industry. In this paper a description of recent advances in optical metrology and alignment modeling is presented. The theory of high numerical aperture image simulation for partially coherent illumination is discussed. The implications of telecentric optics on the image simulation is also presented. Reciprocity tests are proposed as an important measure of numerical accuracy. Diffraction efficiencies for chrome gratings on reticles are one good way to test Kirchoff's approximation as compared to rigorous calculations. We find significant differences between the predictions of Kirchoff's approximation and rigorous methods. The methods for simulating brightfield, confocal, and coherence probe microscope imags are outlined, as are methods for describing aberrations such as coma, spherical aberration, and illumination aperture decentering.

A spectroscopic transfer standard for accurate atmospheric CO measurements

NASA Astrophysics Data System (ADS)

Nwaboh, Javis A.; Li, Gang; Serdyukov, Anton; Werhahn, Olav; Ebert, Volker

2016-04-01

Atmospheric carbon monoxide (CO) is a precursor of essential climate variables and has an indirect effect for enhancing global warming. Accurate and reliable measurements of atmospheric CO concentration are becoming indispensable. WMO-GAW reports states a compatibility goal of ±2 ppb for atmospheric CO concentration measurements. Therefore, the EMRP-HIGHGAS (European metrology research program - high-impact greenhouse gases) project aims at developing spectroscopic transfer standards for CO concentration measurements to meet this goal. A spectroscopic transfer standard would provide results that are directly traceable to the SI, can be very useful for calibration of devices operating in the field, and could complement classical gas standards in the field where calibration gas mixtures in bottles often are not accurate, available or stable enough [1][2]. Here, we present our new direct tunable diode laser absorption spectroscopy (dTDLAS) sensor capable of performing absolute ("calibration free") CO concentration measurements, and being operated as a spectroscopic transfer standard. To achieve the compatibility goal stated by WMO for CO concentration measurements and ensure the traceability of the final concentration results, traceable spectral line data especially line intensities with appropriate uncertainties are needed. Therefore, we utilize our new high-resolution Fourier-transform infrared (FTIR) spectroscopy CO line data for the 2-0 band, with significantly reduced uncertainties, for the dTDLAS data evaluation. Further, we demonstrate the capability of our sensor for atmospheric CO measurements, discuss uncertainty calculation following the guide to the expression of uncertainty in measurement (GUM) principles and show that CO concentrations derived using the sensor, based on the TILSAM (traceable infrared laser spectroscopic amount fraction measurement) method, are in excellent agreement with gravimetric values. Acknowledgement Parts of this work have been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS (Metrology for high-impact greenhouse gases). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] EMRP project ENV52-HIGHGAS (Metrology for high-impact greenhouse gases), available at: http://www.euramet.org/. [2] J. Nwaboh, A. Manninen, J. Mohn, J. C. Petersen, O. Werhahn, and V.Ebert, European Geosciences Union General Assembly 2015, EGU2015-13542, 2015, Vienna Austria

Digital terrain modelling and industrial surface metrology - Converging crafts

USGS Publications Warehouse

Pike, R.J.

2001-01-01

Quantitative characterisation of surface form, increasingly from digital 3-D height data, is cross-disciplinary and can be applied at any scale. Thus, separation of industrial-surface metrology from its Earth-science counterpart, (digital) terrain modelling, is artificial. Their growing convergence presents an opportunity to develop in surface morphometry a unified approach to surface representation. This paper introduces terrain modelling and compares it with metrology, noting their differences and similarities. Examples of potential redundancy among parameters illustrate one of the many issues common to both disciplines. ?? 2001 Elsevier Science Ltd. All rights reserved.

Elimination of 'ghost'-effect-related systematic error in metrology of X-ray optics with a long trace profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Irick, Steve C.; MacDowell, Alastair A.

2005-04-28

A data acquisition technique and relevant program for suppression of one of the systematic effects, namely the ''ghost'' effect, of a second generation long trace profiler (LTP) is described. The ''ghost'' effect arises when there is an unavoidable cross-contamination of the LTP sample and reference signals into one another, leading to a systematic perturbation in the recorded interference patterns and, therefore, a systematic variation of the measured slope trace. Perturbations of about 1-2 {micro}rad have been observed with a cylindrically shaped X-ray mirror. Even stronger ''ghost'' effects show up in an LTP measurement with a mirror having a toroidal surfacemore » figure. The developed technique employs separate measurement of the ''ghost''-effect-related interference patterns in the sample and the reference arms and then subtraction of the ''ghost'' patterns from the sample and the reference interference patterns. The procedure preserves the advantage of simultaneously measuring the sample and reference signals. The effectiveness of the technique is illustrated with LTP metrology of a variety of X-ray mirrors.« less

A Study on Performance and Safety Tests of Electrosurgical Equipment.

PubMed

Tavakoli Golpaygani, A; Movahedi, M M; Reza, M

2016-09-01

Modern medicine employs a wide variety of instruments with different physiological effects and measurements. Periodic verifications are routinely used in legal metrology for industrial measuring instruments. The correct operation of electrosurgical generators is essential to ensure patient's safety and management of the risks associated with the use of high and low frequency electrical currents on human body. The metrological reliability of 20 electrosurgical equipment in six hospitals (3 private and 3 public) was evaluated in one of the provinces of Iran according to international and national standards. The achieved results show that HF leakage current of ground-referenced generators are more than isolated generators and the power analysis of only eight units delivered acceptable output values and the precision in the output power measurements was low. Results indicate a need for new and severe regulations on periodic performance verifications and medical equipment quality control program especially in high risk instruments. It is also necessary to provide training courses for operating staff in the field of meterology in medicine to be acquianted with critical parameters to get accuracy results with operation room equipment.

In-situ sensing using mass spectrometry and its use for run-to-run control on a W-CVD cluster tool

NASA Astrophysics Data System (ADS)

Gougousi, T.; Sreenivasan, R.; Xu, Y.; Henn-Lecordier, L.; Rubloff, G. W.; Kidder, , J. N.; Zafiriou, E.

2001-01-01

A 300 amu closed-ion-source RGA (Leybold-Inficon Transpector 2) sampling gases directly from the reactor of an ULVAC ERA-1000 cluster tool has been used for real time process monitoring of a W CVD process. The process involves H2 reduction of WF6 at a total pressure of 67 Pa (0.5 torr) to produce W films on Si wafers heated at temperatures around 350 °C. The normalized RGA signals for the H2 reagent depletion and the HF product generation were correlated with the W film weight as measured post-process with an electronic microbalance for the establishment of thin-film weight (thickness) metrology. The metrology uncertainty (about 7% for the HF product) was limited primarily by the very low conversion efficiency of the W CVD process (around 2-3%). The HF metrology was then used to drive a robust run-to-run control algorithm, with the deposition time selected as the manipulated (or controlled) variable. For that purpose, during a 10 wafer run, a systematic process drift was introduced as a -5 °C processing temperature change for each successive wafer, in an otherwise unchanged process recipe. Without adjustment of the deposition time the W film weight (thickness) would have declined by about 50% by the 10th wafer. With the aid of the process control algorithm, an adjusted deposition time was computed so as to maintain constant HF sensing signal, resulting in weight (thickness) control comparable to the accuracy of the thickness metrology. These results suggest that in-situ chemical sensing, and particularly mass spectrometry, provide the basis for wafer state metrology as needed to achieve run-to-run control. Furthermore, since the control accuracy was consistent with the metrology accuracy, we anticipate significant improvements for processes as used in manufacturing, where conversion rates are much higher (40-50%) and corresponding signals for metrology will be much larger.

NPL scoops £25m for advanced metrology centre

NASA Astrophysics Data System (ADS)

Singh Chadha, Kulvinder

2013-03-01

The National Physical Laboratory (NPL) in Teddington, UK, is to receive £25m towards the construction of an Advanced Metrology Laboratory (AML) that will contain up to 20 labs and be complete by 2017.

Technique for the metrology calibration of a Fourier transform spectrometer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Spencer, Locke D.; Naylor, David A

2008-11-10

A method is presented for using a Fourier transform spectrometer (FTS) to calibrate the metrology of a second FTS. This technique is particularly useful when the second FTS is inside a cryostat or otherwise inaccessible.

Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors

DOE Office of Scientific and Technical Information (OSTI.GOV)

Berujon, S., E-mail: berujon@esrf.eu; Ziegler, E., E-mail: ziegler@esrf.eu; Cunha, S. da

A new figuring station was designed and installed at the ESRF beamline BM05. It allows the figuring of mirrors within an iterative process combining the advantage of online metrology with dry etching. The complete process takes place under a vacuum environment to minimize surface contamination while non-contact surfacing tools open up the possibility of performing at-wavelength metrology and eliminating placement errors. The aim is to produce mirrors whose slopes do not deviate from the stigmatic profile by more than 0.1 µrad rms while keeping surface roughness in the acceptable limit of 0.1-0.2 nm rms. The desired elliptical mirror surface shapemore » can be achieved in a few iterations in about a one day time span. This paper describes some of the important aspects of the process regarding both the online metrology and the etching process.« less

Developing the Tools for Geologic Repository Monitoring - Andra's Monitoring R and D Program - 12045

DOE Office of Scientific and Technical Information (OSTI.GOV)

Buschaert, S.; Lesoille, S.; Bertrand, J.

2012-07-01

The French Safety Guide recommends that Andra develop a monitoring program to be implemented during repository construction and conducted until (and possibly after) closure, in order to confirm expected behavior and enhance knowledge of relevant processes. To achieve this, Andra has developed an overall monitoring strategy and identified specific technical objectives to inform disposal process management on evolutions relevant to both the long term safety and reversible, pre-closure management of the repository. Andra has launched an ambitious R and D program to ensure that reliable, durable, metrologically qualified and tested monitoring systems will be available at the time of repositorymore » construction in order to respond to monitoring objectives. After four years of a specific R and D program, first observations are described and recommendations are proposed. The results derived from 4 years of Andra's R and D program allow three main observations to be shared. First, while other industries also invest in monitoring equipment, their obvious emphasis will always be on their specific requirements and needs, thus often only providing a partial match with repository requirements. Examples can be found for all available sensors, which are generally not resistant to radiation. Second, the very close scrutiny anticipated for the geologic disposal process is likely to place an unprecedented emphasis on the quality of monitoring results. It therefore seems important to emphasize specific developments with an aim at providing metrologically qualified systems. Third, adapting existing technology to specific repository needs, and providing adequate proof of their worth, is a lengthy process. In conclusion, it therefore seems prudent to plan ahead and to invest wisely in the adequate development of those monitoring tools that will likely be needed in the repository to respond to the implementers' and regulators' requirements, including those agreed and developed to respond to potential stakeholder expectations. (authors)« less

SU-C-9A-02: Structured Noise Index as An Automated Quality Control for Nuclear Medicine: A Two Year Experience

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nelson, J; Christianson, O; Samei, E

Purpose: Flood-field uniformity evaluation is an essential element in the assessment of nuclear medicine (NM) gamma cameras. It serves as the central element of the quality control (QC) program, acquired and analyzed on a daily basis prior to clinical imaging. Uniformity images are traditionally analyzed using pixel value-based metrics which often fail to capture subtle structure and patterns caused by changes in gamma camera performance requiring additional visual inspection which is subjective and time demanding. The goal of this project was to develop and implement a robust QC metrology for NM that is effective in identifying non-uniformity issues, reporting issuesmore » in a timely manner for efficient correction prior to clinical involvement, all incorporated into an automated effortless workflow, and to characterize the program over a two year period. Methods: A new quantitative uniformity analysis metric was developed based on 2D noise power spectrum metrology and confirmed based on expert observer visual analysis. The metric, termed Structured Noise Index (SNI) was then integrated into an automated program to analyze, archive, and report on daily NM QC uniformity images. The effectiveness of the program was evaluated over a period of 2 years. Results: The SNI metric successfully identified visually apparent non-uniformities overlooked by the pixel valuebased analysis methods. Implementation of the program has resulted in nonuniformity identification in about 12% of daily flood images. In addition, due to the vigilance of staff response, the percentage of days exceeding trigger value shows a decline over time. Conclusion: The SNI provides a robust quantification of the NM performance of gamma camera uniformity. It operates seamlessly across a fleet of multiple camera models. The automated process provides effective workflow within the NM spectra between physicist, technologist, and clinical engineer. The reliability of this process has made it the preferred platform for NM uniformity analysis.« less

Metrology requirements for the serial production of ELT primary mirror segments

NASA Astrophysics Data System (ADS)

Rees, Paul C. T.; Gray, Caroline

2015-08-01

The manufacture of the next generation of large astronomical telescopes, the extremely large telescopes (ELT), requires the rapid manufacture of greater than 500 1.44m hexagonal segments for the primary mirror of each telescope. Both leading projects, the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT), have set highly demanding technical requirements for each fabricated segment. These technical requirements, when combined with the anticipated construction schedule for each telescope, suggest that more than one optical fabricator will be involved in the delivery of the primary mirror segments in order to meet the project schedule. For one supplier, the technical specification is challenging and requires highly consistent control of metrology in close coordination with the polishing technologies used in order to optimize production rates. For production using multiple suppliers, however the supply chain is structured, consistent control of metrology along the supply chain will be required. This requires a broader pattern of independent verification than is the case of a single supplier. This paper outlines the metrology requirements for a single supplier throughout all stages of the fabrication process. We identify and outline those areas where metrology accuracy and duration have a significant impact on production efficiency. We use the challenging ESO E-ELT technical specification as an example of our treatment, including actual process data. We further develop this model for the case of a supply chain consisting of multiple suppliers. Here, we emphasize the need to control metrology throughout the supply chain in order to optimize net production efficiency.

High throughput wafer defect monitor for integrated metrology applications in photolithography

NASA Astrophysics Data System (ADS)

Rao, Nagaraja; Kinney, Patrick; Gupta, Anand

2008-03-01

The traditional approach to semiconductor wafer inspection is based on the use of stand-alone metrology tools, which while highly sensitive, are large, expensive and slow, requiring inspection to be performed off-line and on a lot sampling basis. Due to the long cycle times and sparse sampling, the current wafer inspection approach is not suited to rapid detection of process excursions that affect yield. The semiconductor industry is gradually moving towards deploying integrated metrology tools for real-time "monitoring" of product wafers during the manufacturing process. Integrated metrology aims to provide end-users with rapid feedback of problems during the manufacturing process, and the benefit of increased yield, and reduced rework and scrap. The approach of monitoring 100% of the wafers being processed requires some trade-off in sensitivity compared to traditional standalone metrology tools, but not by much. This paper describes a compact, low-cost wafer defect monitor suitable for integrated metrology applications and capable of detecting submicron defects on semiconductor wafers at an inspection rate of about 10 seconds per wafer (or 360 wafers per hour). The wafer monitor uses a whole wafer imaging approach to detect defects on both un-patterned and patterned wafers. Laboratory tests with a prototype system have demonstrated sensitivity down to 0.3 µm on un-patterned wafers and down to 1 µm on patterned wafers, at inspection rates of 10 seconds per wafer. An ideal application for this technology is preventing photolithography defects such as "hot spots" by implementing a wafer backside monitoring step prior to exposing wafers in the lithography step.

Metrology to quantify wear and creep of polyethylene tibial knee inserts.

PubMed

Muratoglu, Orhun K; Perinchief, Rebecca S; Bragdon, Charles R; O'Connor, Daniel O; Konrad, Reto; Harris, William H

2003-05-01

Assessment of damage on articular surfaces of ultrahigh molecular weight polyethylene tibial knee inserts primarily has been limited to qualitative methods, such as visual observation and classification of features such as pitting, delamination, and subsurface cracking. Semiquantitative methods also have been proposed to determine the linear penetration and volume of the scar that forms on articular surfaces of tibial knee inserts. The current authors report a new metrologic method that uses a coordinate measuring machine to quantify the dimensions of this scar. The articular surface of the insert is digitized with the coordinate measuring machine before and after regular intervals of testing on a knee simulator. The volume and linear penetration of the scar are calculated by mathematically taking the difference between the digitized surface maps of the worn and unworn articular surfaces. Three conventional polyethylene tibial knee inserts of a posterior cruciate-sparing design were subjected to five million cycles of normal gait on a displacement-driven knee wear simulator in bovine serum. A metrologic method was used to calculate creep and wear contributions to the scar formation on each tibial plateau. Weight loss of the inserts was determined gravimetrically with the appropriate correction for fluid absorption. The total average wear volume was 43 +/- 9 and 41 +/- 4 mm3 measured by the metrologic and gravimetric methods, respectively. The wear rate averaged 8.3 +/- 0.9 and 8.5 +/- 1.6 mm3 per million cycles measured by the metrologic and gravimetric methods, respectively. These comparisons reflected strong agreement between the metrologic and gravimetric methods.

Absolute optical metrology : nanometers to kilometers

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge; Lay, O. P.; Peters, R. D.; Liebe, C. C.

2005-01-01

We provide and overview of the developments in the field of high-accuracy absolute optical metrology with emphasis on space-based applications. Specific work on the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor is described along with novel applications of the sensor.

Metrology laboratory requirements for third-generation synchrotron radiation sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takacs, P.Z.; Quian, Shinan

1997-11-01

New third-generation synchrotron radiation sources that are now, or will soon, come on line will need to decide how to handle the testing of optical components delivered for use in their beam lines. In many cases it is desirable to establish an in-house metrology laboratory to do the work. We review the history behind the formation of the Optical Metrology Laboratory at Brookhaven National Laboratory and the rationale for its continued existence. We offer suggestions to those who may be contemplating setting up similar facilities, based on our experiences over the past two decades.

Metrological Reliability of Medical Devices

NASA Astrophysics Data System (ADS)

Costa Monteiro, E.; Leon, L. F.

2015-02-01

The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

Albuquerque Regional Training: The Third Seminar on Surface Metrology for the Americas May 12-13 2014

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tran, Sophie M; Tran, Hy D.

The Third Seminar on Surface Metrology for the Americas (SSMA) took place in Albuquerque, New Mexico May 12-13, 2014. The conference was at the Marriott Hotel, in the heart of Albuquerque Uptown, within walking distance of many fantastic restaurants. Why surface metrology? Ask Professor Chris Brown of Worcester Polytechnic Institute (WPI), the chair of the first two SSMAs in 2011 and 2012 and the chair of the ASME B46 committee on classification and designation of surface qualities, and Professor Brown responds: “Because surfaces cover everything.”

In-Line Detection and Measurement of Molecular Contamination in Semiconductor Process Solutions

NASA Astrophysics Data System (ADS)

Wang, Jason; West, Michael; Han, Ye; McDonald, Robert C.; Yang, Wenjing; Ormond, Bob; Saini, Harmesh

2005-09-01

This paper discusses a fully automated metrology tool for detection and quantitative measurement of contamination, including cationic, anionic, metallic, organic, and molecular species present in semiconductor process solutions. The instrument is based on an electrospray ionization time-of-flight mass spectrometer (ESI-TOF/MS) platform. The tool can be used in diagnostic or analytical modes to understand process problems in addition to enabling routine metrology functions. Metrology functions include in-line contamination measurement with near real-time trend analysis. This paper discusses representative organic and molecular contamination measurement results in production process problem solving efforts. The examples include the analysis and identification of organic compounds in SC-1 pre-gate clean solution; urea, NMP (N-Methyl-2-pyrrolidone) and phosphoric acid contamination in UPW; and plasticizer and an organic sulfur-containing compound found in isopropyl alcohol (IPA). It is expected that these unique analytical and metrology capabilities will improve the understanding of the effect of organic and molecular contamination on device performance and yield. This will permit the development of quantitative correlations between contamination levels and process degradation. It is also expected that the ability to perform routine process chemistry metrology will lead to corresponding improvements in manufacturing process control and yield, the ability to avoid excursions and will improve the overall cost effectiveness of the semiconductor manufacturing process.

Final report on the key comparison CCM.P-K4.2012 in absolute pressure from 1 Pa to 10 kPa

NASA Astrophysics Data System (ADS)

Ricker, Jacob; Hendricks, Jay; Bock, Thomas; Dominik, Pražák; Kobata, Tokihiko; Torres, Jorge; Sadkovskaya, Irina

2017-01-01

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Institute of Japan (NMIJ), Centro Nacional de Metrología (CENAM), and DI Mendeleyev Institute for Metrology (VNIIM). The comparison was made via a calibrated transfer standard measured at each of the NMIs facilities using their laboratory standard during the period May 2012 to September 2013. The transfer package constructed for this comparison preformed as designed and provided a stable artifact to compare laboratory standards. Overall the participants were found to be statistically equivalent to the key comparison reference value. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology Optical Power Budgeting in SIM Using Statistical Analysis Techniques

NASA Technical Reports Server (NTRS)

Kuan, Gary M

2008-01-01

The Space Interferometry Mission (SIM) is a space-based stellar interferometry instrument, consisting of up to three interferometers, which will be capable of micro-arc second resolution. Alignment knowledge of the three interferometer baselines requires a three-dimensional, 14-leg truss with each leg being monitored by an external metrology gauge. In addition, each of the three interferometers requires an internal metrology gauge to monitor the optical path length differences between the two sides. Both external and internal metrology gauges are interferometry based, operating at a wavelength of 1319 nanometers. Each gauge has fiber inputs delivering measurement and local oscillator (LO) power, split into probe-LO and reference-LO beam pairs. These beams experience power loss due to a variety of mechanisms including, but not restricted to, design efficiency, material attenuation, element misalignment, diffraction, and coupling efficiency. Since the attenuation due to these sources may degrade over time, an accounting of the range of expected attenuation is needed so an optical power margin can be book kept. A method of statistical optical power analysis and budgeting, based on a technique developed for deep space RF telecommunications, is described in this paper and provides a numerical confidence level for having sufficient optical power relative to mission metrology performance requirements.

Absolute, pressure-dependent validation of a calibration-free, airborne laser hygrometer transfer standard (SEALDH-II) from 5 to 1200 ppmv using a metrological humidity generator

NASA Astrophysics Data System (ADS)

Buchholz, Bernhard; Ebert, Volker

2018-01-01

Highly accurate water vapor measurements are indispensable for understanding a variety of scientific questions as well as industrial processes. While in metrology water vapor concentrations can be defined, generated, and measured with relative uncertainties in the single percentage range, field-deployable airborne instruments deviate even under quasistatic laboratory conditions up to 10-20 %. The novel SEALDH-II hygrometer, a calibration-free, tuneable diode laser spectrometer, bridges this gap by implementing a new holistic concept to achieve higher accuracy levels in the field. We present in this paper the absolute validation of SEALDH-II at a traceable humidity generator during 23 days of permanent operation at 15 different H2O mole fraction levels between 5 and 1200 ppmv. At each mole fraction level, we studied the pressure dependence at six different gas pressures between 65 and 950 hPa. Further, we describe the setup for this metrological validation, the challenges to overcome when assessing water vapor measurements on a high accuracy level, and the comparison results. With this validation, SEALDH-II is the first airborne, metrologically validated humidity transfer standard which links several scientific airborne and laboratory measurement campaigns to the international metrological water vapor scale.

SAQP pitch walk metrology using single target metrology

NASA Astrophysics Data System (ADS)

Fang, Fang; Herrera, Pedro; Kagalwala, Taher; Camp, Janay; Vaid, Alok; Pandev, Stilian; Zach, Franz

2017-03-01

Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the resolution limitations of immersion scanners. Of the four spaces generated in this process from one lithography pattern two tend to be equivalent as they are derived from the first spacer deposition. The three independent spaces are commonly labelled as α, β and γ. α, β and γ are controlled by multiple process steps including the initial lithographic patterning process, the two mandrel and spacer etches as well as the two spacer depositions. Scatterometry has been the preferred metrology approach, however is restricted to repetitive arrays. In these arrays independent measurements, in particular of alpha and gamma, are not possible due to degeneracy of the standard array targets. . In this work we present a single target approach which lifts the degeneracies commonly encountered while using product relevant layout geometries. We will first describe the metrology approach which includes the previously described SRM (signal response metrology) combined with reference data derived from CD SEM data. The performance of the methodology is shown in figures 1-3. In these figures the optically determined values for alpha, beta and gamma are compared to the CD SEM reference data. The variations are achieved using controlled process experiments varying Mandrel CD and Spacer deposition thicknesses.

Flight Programs and X-ray Optics Development at MSFC

NASA Technical Reports Server (NTRS)

Gubarev, M.; Ramsey, B.; O'Dell, S. L.; Elsner, R.; Kilaru, K.; Atkins, C.; Swartz, D.; Gaskin, J.; Weisskopf, Martin

2012-01-01

The X-ray astronomy group at the Marshall Space Flight Center is developing electroformed nickel/cobalt x-ray optics for suborbital and orbital experiments. Suborbital instruments include the Focusing X-ray Solar Imager (FOXSI) and Micro-X sounding rocket experiments and the HERO balloon payload. Our current orbital program is the fabrication of a series of mirror modules for the Astronomical Roentgen Telescope (ART) to be launched on board the Russian-German Spectrum Roentgen Gamma Mission (SRG.) The details and status of these various programs are presented. A second component of our work is the development of fabrication techniques and optical metrology to improve the angular resolution of thin shell optics to the arcsecond-level. The status of these x-ray optics technology developments is also presented.

Investigation of Zerodur material processing

NASA Technical Reports Server (NTRS)

Johnson, R. Barry

1993-01-01

The Final Report of the Center for Applied Optics (CAO), of The University of Alabama (UAH) study entitled 'Investigation of Zerodur Material Processing' is presented. The objectives of the effort were to prepare glass samples by cutting, grinding, etching, and polishing block Zerodur to desired specifications using equipment located in the optical shop located in the Optical System Branch at NASA/MSFC; characterize samples for subsurface damage and surface roughness; utilize Zerodur samples for coating investigations; and perform investigations into enhanced optical fabrication and metrology techniques. The results of this investigation will be used to support the Advanced X Ray Astrophysics Facility (AXAF) program as well as other NASA/MSFC research programs. The results of the technical effort are presented and discussed.

Advanced metrology by offline SEM data processing

NASA Astrophysics Data System (ADS)

Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

2017-06-01

Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

Toward Advancing Nano-Object Count Metrology: A Best Practice Framework

PubMed Central

Boyko, Volodymyr; Meyers, Greg; Voetz, Matthias; Wohlleben, Wendel

2013-01-01

Background: A movement among international agencies and policy makers to classify industrial materials by their number content of sub–100-nm particles could have broad implications for the development of sustainable nanotechnologies. Objectives: Here we highlight current particle size metrology challenges faced by the chemical industry due to these emerging number percent content thresholds, provide a suggested best-practice framework for nano-object identification, and identify research needs as a path forward. Discussion: Harmonized methods for identifying nanomaterials by size and count for many real-world samples do not currently exist. Although particle size remains the sole discriminating factor for classifying a material as “nano,” inconsistencies in size metrology will continue to confound policy and decision making. Moreover, there are concerns that the casting of a wide net with still-unproven metrology methods may stifle the development and judicious implementation of sustainable nanotechnologies. Based on the current state of the art, we propose a tiered approach for evaluating materials. To enable future risk-based refinements of these emerging definitions, we recommend that this framework also be considered in environmental and human health research involving the implications of nanomaterials. Conclusion: Substantial scientific scrutiny is needed in the area of nanomaterial metrology to establish best practices and to develop suitable methods before implementing definitions based solely on number percent nano-object content for regulatory purposes. Strong cooperation between industry, academia, and research institutions will be required to fully develop and implement detailed frameworks for nanomaterial identification with respect to emerging count-based metrics. Citation: Brown SC, Boyko V, Meyers G, Voetz M, Wohlleben W. 2013. Toward advancing nano-object count metrology: a best practice framework. Environ Health Perspect 121:1282–1291; http://dx.doi.org/10.1289/ehp.1306957 PMID:24076973

Metrology and ionospheric observation standards

NASA Astrophysics Data System (ADS)

Panshin, Evgeniy; Minligareev, Vladimir; Pronin, Anton

Accuracy and ionospheric observation validity are urgent trends nowadays. WMO, URSI and national metrological and standardisation services bring forward requirements and descriptions of the ionospheric observation means. Researches in the sphere of metrological and standardisation observation moved to the next level in the Russian Federation. Fedorov Institute of Applied Geophysics (IAG) is in charge of ionospheric observation in the Russian Federation and the National Technical Committee, TC-101 , which was set up on the base of IAG- of the standardisation in the sphere. TC-101 can be the platform for initiation of the core international committee in the network of ISO The new type of the ionosounde “Parus-A” is engineered, which is up to the national requirements. “Parus-A” calibration and test were conducted by National metrological Institute (NMI) -D.I. Mendeleyev Institute for Metrology (VNIIM), signed CIMP MRA in 1991. VNIIM is a basic NMI in the sphere of Space weather (including ionospheric observations), the founder of which was celebrated chemist and metrologist Dmitriy I. Mendeleyev. Tests and calibration were carried out for the 1st time throughout 50-year-history of ionosonde exploitation in Russia. The following metrological characteristics were tested: -measurement range of radiofrequency time delay 0.5-10 ms; -time measurement inaccuracy of radio- frequency pulse ±12mcs; -frequency range of radio impulse 1-20 MHz ; -measurement inaccuracy of radio impulse carrier frequency± 5KHz. For example, the sound impulse simulator that was built-in in the ionosounde was used for measurement range of radiofrequency time delay testing. The number of standards on different levels is developed. - “Ionospheric observation guidance”; - “The Earth ionosphere. Terms and definitions”.

DFM flow by using combination between design based metrology system and model based verification at sub-50nm memory device

NASA Astrophysics Data System (ADS)

Kim, Cheol-kyun; Kim, Jungchan; Choi, Jaeseung; Yang, Hyunjo; Yim, Donggyu; Kim, Jinwoong

2007-03-01

As the minimum transistor length is getting smaller, the variation and uniformity of transistor length seriously effect device performance. So, the importance of optical proximity effects correction (OPC) and resolution enhancement technology (RET) cannot be overemphasized. However, OPC process is regarded by some as a necessary evil in device performance. In fact, every group which includes process and design, are interested in whole chip CD variation trend and CD uniformity, which represent real wafer. Recently, design based metrology systems are capable of detecting difference between data base to wafer SEM image. Design based metrology systems are able to extract information of whole chip CD variation. According to the results, OPC abnormality was identified and design feedback items are also disclosed. The other approaches are accomplished on EDA companies, like model based OPC verifications. Model based verification will be done for full chip area by using well-calibrated model. The object of model based verification is the prediction of potential weak point on wafer and fast feed back to OPC and design before reticle fabrication. In order to achieve robust design and sufficient device margin, appropriate combination between design based metrology system and model based verification tools is very important. Therefore, we evaluated design based metrology system and matched model based verification system for optimum combination between two systems. In our study, huge amount of data from wafer results are classified and analyzed by statistical method and classified by OPC feedback and design feedback items. Additionally, novel DFM flow would be proposed by using combination of design based metrology and model based verification tools.

Overlay metrology for double patterning processes

NASA Astrophysics Data System (ADS)

Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

2009-03-01

The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double patterning processes.

Modelling of the X,Y,Z positioning errors and uncertainty evaluation for the LNE’s mAFM using the Monte Carlo method

NASA Astrophysics Data System (ADS)

Ceria, Paul; Ducourtieux, Sebastien; Boukellal, Younes; Allard, Alexandre; Fischer, Nicolas; Feltin, Nicolas

2017-03-01

In order to evaluate the uncertainty budget of the LNE’s mAFM, a reference instrument dedicated to the calibration of nanoscale dimensional standards, a numerical model has been developed to evaluate the measurement uncertainty of the metrology loop involved in the XYZ positioning of the tip relative to the sample. The objective of this model is to overcome difficulties experienced when trying to evaluate some uncertainty components which cannot be experimentally determined and more specifically, the one linked to the geometry of the metrology loop. The model is based on object-oriented programming and developed under Matlab. It integrates one hundred parameters that allow the control of the geometry of the metrology loop without using analytical formulae. The created objects, mainly the reference and the mobile prism and their mirrors, the interferometers and their laser beams, can be moved and deformed freely to take into account several error sources. The Monte Carlo method is then used to determine the positioning uncertainty of the instrument by randomly drawing the parameters according to their associated tolerances and their probability density functions (PDFs). The whole process follows Supplement 2 to ‘The Guide to the Expression of the Uncertainty in Measurement’ (GUM). Some advanced statistical tools like Morris design and Sobol indices are also used to provide a sensitivity analysis by identifying the most influential parameters and quantifying their contribution to the XYZ positioning uncertainty. The approach validated in the paper shows that the actual positioning uncertainty is about 6 nm. As the final objective is to reach 1 nm, we engage in a discussion to estimate the most effective way to reduce the uncertainty.

III International Conference on Laser and Plasma Researches and Technologies

NASA Astrophysics Data System (ADS)

2017-12-01

A.P. Kuznetsov and S.V. Genisaretskaya III Conference on Plasma and Laser Research and Technologies took place on January 24th until January 27th, 2017 at the National Research Nuclear University "MEPhI" (NRNU MEPhI). The Conference was organized by the Institute for Laser and Plasma Technologies and was supported by the Competitiveness Program of NRNU MEPhI. The conference program consisted of nine sections: • Laser physics and its application • Plasma physics and its application • Laser, plasma and radiation technologies in industry • Physics of extreme light fields • Controlled thermonuclear fusion • Modern problems of theoretical physics • Challenges in physics of solid state, functional materials and nanosystems • Particle accelerators and radiation technologies • Modern trends of quantum metrology. The conference is based on scientific fields as follows: • Laser, plasma and radiation technologies in industry, energetic, medicine; • Photonics, quantum metrology, optical information processing; • New functional materials, metamaterials, “smart” alloys and quantum systems; • Ultrahigh optical fields, high-power lasers, Mega Science facilities; • High-temperature plasma physics, environmentally-friendly energetic based on controlled thermonuclear fusion; • Spectroscopic synchrotron, neutron, laser research methods, quantum mechanical calculation and computer modelling of condensed media and nanostructures. More than 250 specialists took part in the Conference. They represented leading Russian scientific research centers and universities (National Research Centre "Kurchatov Institute", A.M. Prokhorov General Physics Institute, P.N. Lebedev Physical Institute, Troitsk Institute for Innovation and Fusion Research, Joint Institute for Nuclear Research, Moscow Institute of Physics and Tecnology and others) and leading scientific centers and universities from Germany, France, USA, Canada, Japan. We would like to thank heartily all of the speakers, participants, organizing and program committee members for their contribution to the conference.

FOREWORD: Neutron metrology Neutron metrology

NASA Astrophysics Data System (ADS)

Thomas, David J.; Nolte, Ralf; Gressier, Vincent

2011-12-01

The International Committee for Weights and Measures (CIPM) has consultative committees covering various areas of metrology. The Consultative Committee for Ionizing Radiation (CCRI) differs from the others in having three sections: Section (I) deals with radiation dosimetry, Section (II) with radionuclide metrology and Section (III) with neutron metrology. In 2003 a proposal was made to publish special issues of Metrologia covering the work of the three Sections. Section (II) was the first to complete their task, and their special issue was published in 2007, volume 44(4). This was followed in 2009 by the special issue on radiation dosimetry, volume 46(2). The present issue, volume 48(6), completes the trilogy and attempts to explain neutron metrology, the youngest of the three disciplines, the neutron only having been discovered in 1932, to a wider audience and to highlight the relevance and importance of this field. When originally approached with the idea of this special issue, Section (III) immediately saw the value of a publication specifically on neutron metrology. It is a topic area where papers tend to be scattered throughout the literature in journals covering, for example, nuclear instrumentation, radiation protection or radiation measurements in general. Review articles tend to be few. People new to the field often ask for an introduction to the various topics. There are some excellent older textbooks, but these are now becoming obsolete. More experienced workers in specific areas of neutron metrology can find it difficult to know the latest position in related areas. The papers in this issue attempt, without presenting a purely historical outline, to describe the field in a sufficiently logical way to provide the novice with a clear introduction, while being sufficiently up-to-date to provide the more experienced reader with the latest scientific developments in the different topic areas. Neutron radiation fields obviously occur throughout the nuclear industry, from the initial fuel enrichment and fabrication processes right through to storage or reprocessing, and neutron metrology is clearly important in this area. Neutron fields do, however, occur in other areas, for example where neutron sources are used in oil well logging and moisture measurements. They also occur around high energy accelerators, including photon linear accelerators used for cancer therapy, and are expected to be a more serious problem around the new hadron radiation therapy facilities. Roughly 50% of the cosmic ray doses experienced by fliers at the flight altitudes of commercial aircraft are due to neutrons. Current research on fusion presents neutron metrology with a whole new range of challenges because of the very high fluences expected. One of the most significant features of neutron fields is the very wide range of possible neutron energies. In the nuclear industry, for example, neutrons occur with energies from those of thermal neutrons at a few meV to the upper end of the fission spectrum at perhaps 10 MeV. For cosmic ray dosimetry the energy range extends into the GeV region. This enormous range sets a challenge for designing measuring devices and a parallel challenge of developing measurement standards for characterizing these devices. One of the major considerations when deciding on topics for this special issue was agreeing on what not to include. Modelling, i.e. the use of radiation transport codes, is now a very important aspect of neutron measurements. These calculations are vital for shielding and for instrument design; nevertheless, the topic has only been included here where it has a direct bearing on metrology and the development of standards. Neutron spectrometry is an increasingly important technique for unravelling some of the problems of dose equivalent measurements and for plasma diagnostics in fusion research. However, this topic is at least one step removed from primary metrology and so it was felt that it should not be covered, particularly as a compendium of papers on spectrometry for radiation protection has been published relatively recently [1]. The CIPM Mutual Recognition Arrangement (CIPM MRA), whereby national measurement standards and certificates issued by different national metrology institutes (NMIs) can be recognized internationally, is covered only briefly, although the key comparisons which underpin the CIPM MRA are highlighted. The papers included in this issue concentrate on the primary physical quantities—neutron source emission rate and neutron fluence, papers on the latter quantity covering the wide range of neutron energies for which standards are required. Neutron cross sections are fundamental to neutron physics and their importance in neutron metrology is also covered. A large amount of work by acknowledged experts in neutron metrology has gone into the preparation of this special issue and we are indebted to them for their time and effort. The list of contributors begins with the authors of the papers but also includes the referees who provided invisible but invaluable input. We are grateful for the support and encouragement of Professor Georgio Moscati, president of the CCRI when the work was proposed, Dr Kim Carneiro the current president, and Dr Penny Allisy-Roberts the executive secretary of the CCRI. When this work was first proposed a list of potential topics was drawn up by the then chairman of Section (III) Dr Horst Klein. It is a measure of his insight and knowledge of the field that the resulting document matches almost exactly the original plan he drew up. This special issue is thus a tribute to his very extensive contribution to the field. We sincerely hope its contents provide an accurate picture of the present state of neutron metrology in view of Dr Klein's conviction of the importance in metrology of getting things right. Reference [1] Thomas D J and Klein H (ed) 2003 Neutron and photon spectrometry techniques for radiation protection Radiat. Prot. Dosim. 107 1-204

7 CFR 802.1 - Qualified laboratories.

Code of Federal Regulations, 2011 CFR

2011-01-01

... 7 Agriculture 7 2011-01-01 2011-01-01 false Qualified laboratories. 802.1 Section 802.1... REQUIREMENTS FOR GRAIN WEIGHING EQUIPMENT AND RELATED GRAIN HANDLING SYSTEMS § 802.1 Qualified laboratories. (a) Metrology laboratories. (1) Any State metrology laboratory currently approved by the NBS ongoing...

DABAM: an open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

2016-04-20

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians.

PubMed

Pang, Shengshi; Jordan, Andrew N

2017-03-09

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T 2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T 4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case.

DABAM: an open-source database of X-ray mirrors metrology

PubMed Central

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; Glass, Mark; Idir, Mourad; Metz, Jim; Raimondi, Lorenzo; Rebuffi, Luca; Reininger, Ruben; Shi, Xianbo; Siewert, Frank; Spielmann-Jaeggi, Sibylle; Takacs, Peter; Tomasset, Muriel; Tonnessen, Tom; Vivo, Amparo; Yashchuk, Valeriy

2016-01-01

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database. PMID:27140145

Phase-locking to a free-space terahertz comb for metrological-grade terahertz lasers.

PubMed

Consolino, L; Taschin, A; Bartolini, P; Bartalini, S; Cancio, P; Tredicucci, A; Beere, H E; Ritchie, D A; Torre, R; Vitiello, M S; De Natale, P

2012-01-01

Optical frequency comb synthesizers have represented a revolutionary approach to frequency metrology, providing a grid of frequency references for any laser emitting within their spectral coverage. Extending the metrological features of optical frequency comb synthesizers to the terahertz domain would be a major breakthrough, due to the widespread range of accessible strategic applications and the availability of stable, high-power and widely tunable sources such as quantum cascade lasers. Here we demonstrate phase-locking of a 2.5 THz quantum cascade laser to a free-space comb, generated in a LiNbO(3) waveguide and covering the 0.1-6 THz frequency range. We show that even a small fraction (<100 nW) of the radiation emitted from the quantum cascade laser is sufficient to generate a beat note suitable for phase-locking to the comb, paving the way to novel metrological-grade terahertz applications, including high-resolution spectroscopy, manipulation of cold molecules, astronomy and telecommunications.

The SIM Time Network

PubMed Central

Lombardi, Michael A.; Novick, Andrew N.; Lopez R, J. Mauricio; Jimenez, Francisco; de Carlos Lopez, Eduardo; Boulanger, Jean-Simon; Pelletier, Raymond; de Carvalho, Ricardo J.; Solis, Raul; Sanchez, Harold; Quevedo, Carlos Andres; Pascoe, Gregory; Perez, Daniel; Bances, Eduardo; Trigo, Leonardo; Masi, Victor; Postigo, Henry; Questelles, Anthony; Gittens, Anselm

2011-01-01

The Sistema Interamericano de Metrologia (SIM) is a regional metrology organization (RMO) whose members are the national metrology institutes (NMIs) located in the 34 nations of the Organization of American States (OAS). The SIM/OAS region extends throughout North, Central, and South America and the Caribbean Islands. About half of the SIM NMIs maintain national standards of time and frequency and must participate in international comparisons in order to establish metrological traceability to the International System (SI) of units. The SIM time network (SIMTN) was developed as a practical, cost effective, and technically sound way to automate these comparisons. The SIMTN continuously compares the time standards of SIM NMIs and produces measurement results in near real-time by utilizing the Internet and the Global Positioning System (GPS). Fifteen SIM NMIs have joined the network as of December 2010. This paper provides a brief overview of SIM and a technical description of the SIMTN. It presents international comparison results and examines the measurement uncertainties. It also discusses the metrological benefits that the network provides to its participants. PMID:26989584

DABAM: An open-source database of X-ray mirrors metrology

DOE PAGES

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; ...

2016-05-01

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. In conclusion, some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

The SIM Time Network.

PubMed

Lombardi, Michael A; Novick, Andrew N; Lopez R, J Mauricio; Jimenez, Francisco; de Carlos Lopez, Eduardo; Boulanger, Jean-Simon; Pelletier, Raymond; de Carvalho, Ricardo J; Solis, Raul; Sanchez, Harold; Quevedo, Carlos Andres; Pascoe, Gregory; Perez, Daniel; Bances, Eduardo; Trigo, Leonardo; Masi, Victor; Postigo, Henry; Questelles, Anthony; Gittens, Anselm

2011-01-01

The Sistema Interamericano de Metrologia (SIM) is a regional metrology organization (RMO) whose members are the national metrology institutes (NMIs) located in the 34 nations of the Organization of American States (OAS). The SIM/OAS region extends throughout North, Central, and South America and the Caribbean Islands. About half of the SIM NMIs maintain national standards of time and frequency and must participate in international comparisons in order to establish metrological traceability to the International System (SI) of units. The SIM time network (SIMTN) was developed as a practical, cost effective, and technically sound way to automate these comparisons. The SIMTN continuously compares the time standards of SIM NMIs and produces measurement results in near real-time by utilizing the Internet and the Global Positioning System (GPS). Fifteen SIM NMIs have joined the network as of December 2010. This paper provides a brief overview of SIM and a technical description of the SIMTN. It presents international comparison results and examines the measurement uncertainties. It also discusses the metrological benefits that the network provides to its participants.

Contour metrology using critical dimension atomic force microscopy

NASA Astrophysics Data System (ADS)

Orji, Ndubuisi G.; Dixson, Ronald G.; Vladár, András E.; Ming, Bin; Postek, Michael T.

2012-03-01

The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a complementary instrument for contour measurement and verification. Although data from CD-AFM is inherently three dimensional, the planar two-dimensional data required for contour metrology is not easily extracted from the top-down CD-AFM data. This is largely due to the limitations of the CD-AFM method for controlling the tip position and scanning. We describe scanning techniques and profile extraction methods to obtain contours from CD-AFM data. We also describe how we validated our technique, and explain some of its limitations. Potential sources of error for this approach are described, and a rigorous uncertainty model is presented. Our objective is to show which data acquisition and analysis methods could yield optimum contour information while preserving some of the strengths of CD-AFM metrology. We present comparison of contours extracted using our technique to those obtained from the scanning electron microscope (SEM), and the helium ion microscope (HIM).

Importance of education and competence maintenance in metrology field (measurement science)

NASA Astrophysics Data System (ADS)

Dobiliene, J.; Meskuotiene, A.

2015-02-01

For certain tasks in metrology field trained employers might be necessary to fulfill specific requirements. It is important to pay attention that metrologists are responsible for fluent work of devices that belong to huge variety of vide spectrum of measurements. People who perform measurements (that are related to our safety, security or everyday life) with reliable measuring instruments must be sure for trueness of their results or conclusions. So with the purpose to reach the harmony between the ordinary man and his used means it is very important to ensure competence of specialists that are responsible for mentioned harmony implementation. Usually these specialists have a university degree and perform highly specified tasks in science, industry or laboratories. Their task is quite narrow. For example, type approval of measuring instrument or calibration and verification. Due to the fact that the number of such employers and their tasks is relatively small in the field of legal metrology, this paper focuses on the significance of training and qualification of legal metrology officers.

DABAM: an open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

DABAM: An open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. In conclusion, some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

MetroFission: New high-temperature references and sensors for the nuclear industry

NASA Astrophysics Data System (ADS)

Sadli, M.; del Campo, D.; de Podesta, M.; Deuzé, T.; Failleau, G.; Elliott, C. J.; Fourrez, S.; García, C.; Pearce, J. V.

2013-09-01

The European metrology research programme (EMRP) allows funding for metrology-oriented projects in the frame of targeted calls aimed at improving metrology for important contemporary and future needs in different fields such as energy, environment and industry. A joint research project (JRP), called "MetroFission", was selected for funding in the "Energy" call of 2010. This JRP, led by NPL (UK), aims to anticipate and to start addressing the metrological needs of the next generation of nuclear power plants. The need for improving the accuracy and reliability of temperature measurements at temperatures higher than those currently measured in nuclear power plants is dealt with in the first workpackage of the project. This project started in September 2010 and will last for three years. This paper summarizes the activities of the first half of the project and the expected final achievements, which will be essentially oriented towards new temperature references and new devices, adapted to the high temperature range as well as the particularly harsh working conditions.

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians

PubMed Central

Pang, Shengshi; Jordan, Andrew N.

2017-01-01

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case. PMID:28276428

Recent achievements using chemical vapor composite silicon carbide (CVC SiC)

NASA Astrophysics Data System (ADS)

Goodman, William A.; Tanaka, Clifford

2009-08-01

This annual review documents our progress towards inexpensive mass production of silicon carbide mirrors and optical structures. Results are provided for a NASA Small Business Technology Transfer (STTR) X-Ray Mirror project. Trex partnered with the University of Alabama-Huntsville Center for Advanced Optics (UAH-CAO) to develop fabrication methods for polished cylindrical and conical chemical vapor composite (CVCTM) SiC mandrels. These mandrels are envisioned as pre-forms for the replication of fused silica x-ray optics to be eventually used in the International X-Ray Observatory (IXO). CVC SiCTM offers superior high temperature stability, thermal and mechanical performance and polishability required for this precision replication process. In this program, Trex fabricated prototype mandrels with design diameters of 10.5cm, 20cm and 45cm. UAH-CAO was Trex's university partner in this effort and worked on polishing and metrology of the unusual x-ray mandrel geometries. UAH-CAO successfully developed an innovative interferometric method for measuring the CVC SiCTM x-ray mandrels based on a precision cylindrical lens system. UAH-CAO also developed finishing and polishing methods for CVC SiCTM that utilized a Zeeko IRP200 computer controlled polishing tool. The three technologies key technologies demonstrated in this program (near net shape forming of CVC SiCTM mandrels, the x-ray mandrel metrology and free-form polishing capability on CVC SiCTM) could enable cost-effective manufacture of the x-ray mandrels required for the International X-Ray Observatory (IXO).

Error Modeling of Multi-baseline Optical Truss. Part II; Application to SIM Metrology Truss Field Dependent Error

NASA Technical Reports Server (NTRS)

Zhang, Liwei Dennis; Milman, Mark; Korechoff, Robert

2004-01-01

The current design of the Space Interferometry Mission (SIM) employs a 19 laser-metrology-beam system (also called L19 external metrology truss) to monitor changes of distances between the fiducials of the flight system's multiple baselines. The function of the external metrology truss is to aid in the determination of the time-variations of the interferometer baseline. The largest contributor to truss error occurs in SIM wide-angle observations when the articulation of the siderostat mirrors (in order to gather starlight from different sky coordinates) brings to light systematic errors due to offsets at levels of instrument components (which include comer cube retro-reflectors, etc.). This error is labeled external metrology wide-angle field-dependent error. Physics-based model of field-dependent error at single metrology gauge level is developed and linearly propagated to errors in interferometer delay. In this manner delay error sensitivity to various error parameters or their combination can be studied using eigenvalue/eigenvector analysis. Also validation of physics-based field-dependent model on SIM testbed lends support to the present approach. As a first example, dihedral error model is developed for the comer cubes (CC) attached to the siderostat mirrors. Then the delay errors due to this effect can be characterized using the eigenvectors of composite CC dihedral error. The essence of the linear error model is contained in an error-mapping matrix. A corresponding Zernike component matrix approach is developed in parallel, first for convenience of describing the RMS of errors across the field-of-regard (FOR), and second for convenience of combining with additional models. Average and worst case residual errors are computed when various orders of field-dependent terms are removed from the delay error. Results of the residual errors are important in arriving at external metrology system component requirements. Double CCs with ideally co-incident vertices reside with the siderostat. The non-common vertex error (NCVE) is treated as a second example. Finally combination of models, and various other errors are discussed.

Remote laboratories for optical metrology: from the lab to the cloud

NASA Astrophysics Data System (ADS)

Osten, W.; Wilke, M.; Pedrini, G.

2012-10-01

The idea of remote and virtual metrology has been reported already in 2000 with a conceptual illustration by use of comparative digital holography, aimed at the comparison of two nominally identical but physically different objects, e.g., master and sample, in industrial inspection processes. However, the concept of remote and virtual metrology can be extended far beyond this. For example, it does not only allow for the transmission of static holograms over the Internet, but also provides an opportunity to communicate with and eventually control the physical set-up of a remote metrology system. Furthermore, the metrology system can be modeled in the environment of a 3D virtual reality using CAD or similar technology, providing a more intuitive interface to the physical setup within the virtual world. An engineer or scientist who would like to access the remote real world system can log on to the virtual system, moving and manipulating the setup through an avatar and take the desired measurements. The real metrology system responds to the interaction between the avatar and the 3D virtual representation, providing a more intuitive interface to the physical setup within the virtual world. The measurement data are stored and interpreted automatically for appropriate display within the virtual world, providing the necessary feedback to the experimenter. Such a system opens up many novel opportunities in industrial inspection such as the remote master-sample-comparison and the virtual assembling of parts that are fabricated at different places. Moreover, a multitude of new techniques can be envisaged. To them belong modern ways for documenting, efficient methods for metadata storage, the possibility for remote reviewing of experimental results, the adding of real experiments to publications by providing remote access to the metadata and to the experimental setup via Internet, the presentation of complex experiments in classrooms and lecture halls, the sharing of expensive and complex infrastructure within international collaborations, the implementation of new ways for the remote test of new devices, for their maintenance and service, and many more. The paper describes the idea of remote laboratories and illustrates the potential of the approach on selected examples with special attention to optical metrology.

On the traceability of gaseous reference materials

NASA Astrophysics Data System (ADS)

Brown, Richard J. C.; Brewer, Paul J.; Harris, Peter M.; Davidson, Stuart; van der Veen, Adriaan M. H.; Ent, Hugo

2017-06-01

The complex and multi-parameter nature of chemical composition measurement means that establishing traceability is a challenging task. As a result incorrect interpretations about the origin of the metrological traceability of chemical measurement results can occur. This discussion paper examines why this is the case by scrutinising the peculiarities of the gas metrology area. It considers in particular: primary methods, dissemination of metrological traceability and the role of documentary standards and accreditation bodies in promulgating best practice. There is also a discussion of documentary standards relevant to the NMI and reference material producer community which need clarification, and the impact which key stakeholders in the quality infrastructure can bring to these issues.

Metrological assessment of the methods for measuring the contents of acids and ion metals responsible for the exchangeable acidity of soils

NASA Astrophysics Data System (ADS)

Vanchikova, E. V.; Shamrikova, E. V.; Bespyatykh, N. V.; Kyz"yurova, E. V.; Kondratenok, B. M.

2015-02-01

Metrological characteristics—precision, trueness, and accuracy—of the results of measurements of the exchangeable acidity and its components by the potentiometric titration method were studied on the basis of multiple analyses of the soil samples with the examination of statistical data for the outliers and their correspondence to the normal distribution. Measurement errors were estimated. The applied method was certified by the Metrological Center of the Uralian Branch of the Russian Academy of Sciences (certificate no. 88-17641-094-2013) and included in the Federal Information Fund on Assurance of Measurements (FR 1.31.2013.16382).

Mycotoxin metrology: Gravimetric production of zearalenone calibration solution

NASA Astrophysics Data System (ADS)

Rego, E. C. P.; Simon, M. E.; Li, Xiuqin; Li, Xiaomin; Daireaux, A.; Choteau, T.; Westwood, S.; Josephs, R. D.; Wielgosz, R. I.; Cunha, V. S.

2018-03-01

Food safety is a major concern for countries developing metrology and quality assurance systems, including the contamination of food and feed by mycotoxins. To improve the mycotoxin analysis and ensure the metrological traceability, CRM of calibration solution should be used. The production of certified mycotoxin solutions is a major challenge due to the limited amount of standard for conducting a proper purity study and due to the cost of standards. The CBKT project was started at BIPM and Inmetro produced gravimetrically one batch of zearelenone in acetronitrile (14.708 ± 0.016 μg/g, k=2) and conducted homogeneity, stability and value assignment studies.

Axial-Stereo 3-D Optical Metrology for Inner Profile of Pipes Using a Scanning Laser Endoscope

NASA Astrophysics Data System (ADS)

Gong, Yuanzheng; Johnston, Richard S.; Melville, C. David; Seibel, Eric J.

2015-07-01

As the rapid progress in the development of optoelectronic components and computational power, 3-D optical metrology becomes more and more popular in manufacturing and quality control due to its flexibility and high speed. However, most of the optical metrology methods are limited to external surfaces. This article proposed a new approach to measure tiny internal 3-D surfaces with a scanning fiber endoscope and axial-stereo vision algorithm. A dense, accurate point cloud of internally machined threads was generated to compare with its corresponding X-ray 3-D data as ground truth, and the quantification was analyzed by Iterative Closest Points algorithm.

Nano-metrology and terrain modelling - convergent practice in surface characterisation

USGS Publications Warehouse

Pike, R.J.

2000-01-01

The quantification of magnetic-tape and disk topography has a macro-scale counterpart in the Earth sciences - terrain modelling, the numerical representation of relief and pattern of the ground surface. The two practices arose independently and continue to function separately. This methodological paper introduces terrain modelling, discusses its similarities to and differences from industrial surface metrology, and raises the possibility of a unified discipline of quantitative surface characterisation. A brief discussion of an Earth-science problem, subdividing a heterogeneous terrain surface from a set of sample measurements, exemplifies a multivariate statistical procedure that may transfer to tribological applications of 3-D metrological height data.

Performance of the Primary Mirror Center-of-Curvature Optical Metrology System during Cryogenic Testing of the JWST Pathfinder Telescope

NASA Technical Reports Server (NTRS)

Hadaway, James B.; Wells, Conrad; Olczak, Gene; Waldman, Mark; Whitman, Tony; Cosentino, Joseph; Connolly, Mark; Chaney, David; Telfer, Randal

2016-01-01

The JWST primary mirror consists of 18 1.5 m hexagonal segments, each with 6-DoF and RoC adjustment. The telescope will be tested at its cryogenic operating temperature at Johnson Space Center. The testing will include center-of-curvature measurements of the PM, using the Center-of-Curvature Optical Assembly (COCOA) and the Absolute Distance Meter Assembly (ADMA). The performance of these metrology systems, including hardware, software, procedures, was assessed during two cryogenic tests at JSC, using the JWST Pathfinder telescope. This paper describes the test setup, the testing performed, and the resulting metrology system performance.

Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V; Barber, Samuel; Domning, Edward E.

2009-09-11

A new low budget slope measuring instrument, the Developmental Long Trace Profiler (DLTP), was recently brought to operation at the ALS Optical Metrology Laboratory. The design, instrumental control and data acquisition system, initial alignment and calibration procedures, as well as the developed experimental precautions and procedures are described in detail. The capability of the DLTP to achieve sub-microradian surface slope metrology is verified via cross-comparison measurements with other high performance slope measuring instruments when measuring the same high quality test optics. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.

Single-Grating Talbot Imaging for Wavefront Sensing and X-Ray Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Grizolli, Walan; Shi, Xianbo; Kolodziej, Tomasz

2017-01-01

Single-grating Talbot imaging relies on high-spatial-resolution detectors to perform accurate measurements of X-ray beam wavefronts. The wavefront can be retrieved with a single image, and a typical measurement and data analysis can be performed in few seconds. These qualities make it an ideal tool for synchrotron beamline diagnostics and in-situ metrology. The wavefront measurement can be used both to obtain a phase contrast image of an object and to characterize an X-ray beam. In this work, we explore the concept in two cases: at-wavelength metrology of 2D parabolic beryllium lenses and a wavefront sensor using a diamond crystal beam splitter.

Self-Mixing Thin-Slice Solid-State Laser Metrology

PubMed Central

Otsuka, Kenju

2011-01-01

This paper reviews the dynamic effect of thin-slice solid-state lasers subjected to frequency-shifted optical feedback, which led to the discovery of the self-mixing modulation effect, and its applications to quantum-noise-limited versatile laser metrology systems with extreme optical sensitivity. PMID:22319406

Metrological traceability of holmium oxide solution

NASA Astrophysics Data System (ADS)

Gonçalves, D. E. F.; Gomes, J. F. S.; Alvarenga, A. P. D.; Borges, P. P.; Araujo, T. O.

2018-03-01

Holmium oxide solution was prepared as a candidate of certified reference material for spectrophotometer wavelength scale calibration. Here is presented the necessary steps for evaluation of the uncertainty and the establishment of metrological traceability for the production of this material. Preliminary results from the first produced batch are shown.

Kite: status of the external metrology testbed for SIM

NASA Astrophysics Data System (ADS)

Dekens, Frank G.; Alvarez-Salazar, Oscar S.; Azizi, Alireza; Moser, Steven J.; Nemati, Bijan; Negron, John; Neville, Timothy; Ryan, Daniel

2004-10-01

Kite is a system level testbed for the External Metrology System of the Space Interferometry Mission (SIM). The External Metrology System is used to track the fiducials that are located at the centers of the interferometer's siderostats. The relative changes in their positions needs to be tracked to an accuracy of tens of picometers in order to correct for thermal deformations and attitude changes of the spacecraft. Because of the need for such high precision measurements, the Kite testbed was build to test both the metrology gauges and our ability to optically model the system at these levels. The Kite testbed is a redundant metrology truss, in which 6 lengths are measured, but only 5 are needed to define the system. The RMS error between the redundant measurements needs to be less than 140pm for the SIM Wide-Angle observing scenario and less than 8 pm for the Narrow-Angle observing scenario. With our current testbed layout, we have achieved an RMS of 85 pm in the Wide-Angle case, meeting the goal. For the Narrow-Angle case, we have reached 5.8 pm, but only for on-axis observations. We describe the testbed improvements that have been made since our initial results, and outline the future Kite changes that will add further effects that SIM faces in order to make the testbed more representative of SIM.

Coherence enhanced quantum metrology in a nonequilibrium optical molecule

NASA Astrophysics Data System (ADS)

Wang, Zhihai; Wu, Wei; Cui, Guodong; Wang, Jin

2018-03-01

We explore the quantum metrology in an optical molecular system coupled to two environments with different temperatures, using a quantum master equation beyond secular approximation. We discover that the steady-state coherence originating from and sustained by the nonequilibrium condition can enhance quantum metrology. We also study the quantitative measures of the nonequilibrium condition in terms of the curl flux, heat current and entropy production at the steady state. They are found to grow with temperature difference. However, an apparent paradox arises considering the contrary behaviors of the steady-state coherence and the nonequilibrium measures in relation to the inter-cavity coupling strength. This paradox is resolved by decomposing the heat current into a population part and a coherence part. Only the latter, the coherence part of the heat current, is tightly connected to the steady-state coherence and behaves similarly with respect to the inter-cavity coupling strength. Interestingly, the coherence part of the heat current flows from the low-temperature reservoir to the high-temperature reservoir, opposite to the direction of the population heat current. Our work offers a viable way to enhance quantum metrology for open quantum systems through steady-state coherence sustained by the nonequilibrium condition, which can be controlled and manipulated to maximize its utility. The potential applications go beyond quantum metrology and extend to areas such as device designing, quantum computation and quantum technology in general.

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

NASA Astrophysics Data System (ADS)

Acero, R.; Santolaria, J.; Pueo, M.; Aguilar, J. J.; Brau, A.

2015-11-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures.

Photogrammetric Metrology for the James Webb Space Telescope Integrated Science Instrument Module

NASA Technical Reports Server (NTRS)

Nowak, Maria; Crane, Allen; Davila, Pam; Eichhorn, William; Gill, James; Herrera, Acey; Hill, Michael; Hylan, Jason; Jetten, Mark; Marsh, James;

Airborne Comparisons of an Ultra-Stable Quartz Oscillator with a H-Maser as Another Possible Validation of General Relativity

DTIC Science & Technology

1999-12-01

POSSIBLE VALIDATION OF GENERAL RELATIVITY Andrei A. Grishaev Institute of Metrology for Time and Space (IMVP), GP VNIIFTRI 141570 Mendeleevo...Metrology for Time and Space (IMVP),GP VNIIFTRI ,141570 Mendeleevo, Russia, 8. PERFORMING ORGANIZATION REPORT NUMBER 9. SPONSORING/MONITORING AGENCY

Reference Materials for Food and Nutrition Metrology: Past, Present and Future

USDA-ARS?s Scientific Manuscript database

Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970’s the first “biological” RM of Bowens Kale, as well as Orchard Leaves and Bovine Liver SRMs, from the ...

Digital fringe projection for hand surface coordinate variation analysis caused by osteoarthritis

NASA Astrophysics Data System (ADS)

Nor Haimi, Wan Mokhdzani Wan; Hau Tan, Cheek; Retnasamy, Vithyacharan; Vairavan, Rajendaran; Sauli, Zaliman; Roshidah Yusof, Nor; Hambali, Nor Azura Malini Ahmad; Aziz, Muhammad Hafiz Ab; Bakhit, Ahmad Syahir Ahmad

2017-11-01

Hand osteoarthritis is one of the most common forms of arthritis which impact millions of people worldwide. The disabling problem occurs when the protective cartilage on the boundaries of bones wear off over time. Currently, in order to identify hand osteoarthritis, special instruments namely X-ray scanning and MRI are used for the detection but it also has its limitations such as radiation exposure and can be quite costly. In this work, an optical metrology system based on digital fringe projection which comprises of an LCD projector, CCD camera and a personal computer has been developed to anticipate abnormal growth or deformation on the joints of the hand which are common symptoms of osteoarthritis. The main concept of this optical metrology system is to apply structured light as imaging source for surface change detection. The imaging source utilizes fringe patterns generated by C++ programming and is shifted by 3 phase shifts based on the 3 steps 2 shifts method. Phase wrapping technique and analysis were applied in order to detect the deformation of live subjects. The result has demonstrated a successful method of hand deformation detection based on the pixel tracking differences of a normal and deformed state.

Untangling the Herman-infrared spectra of nitrogen atmospheric-pressure dielectric-barrier discharge

NASA Astrophysics Data System (ADS)

Čermák, Peter; Annušová, Adriana; Rakovský, Jozef; Martišovitš, Viktor; Veis, Pavel

2018-05-01

This study presents the first application of the N2 Herman-infrared (HIR) ro-vibrational model for the metrology of the atmospheric-pressure dielectric-barrier discharge. Our recent findings of suitable conditions for observation of the unperturbed HIR system (Annušová et al Contrib. Plasma Phys. 2017) gave us the opportunity to develop and test a numerical representation of this complex system composed of 75 branches. Commonly, the HIR covers a part of the near infrared spectra (690–850 nm) with its bands mixed with the N2 first positive system (1PS), which hinders applications of these systems for optical metrology of the discharge. In this work, we present a complex ro-vibrational model of the 1PS and HIR systems, which allowed us to untangle their spectra and retrieve the rotational temperature and vibrational populations of the systems for the first time. The latter was achieved by coupling the PGHOPHER simulation package with molecular constants obtained from high-resolution experiments. To test the model, the results and precision were compared to the retrievals based on the models of the NO γ and N2 second positive systems using the LIFBASE and SPECAIR programs, respectively.

Engineered diamond nanopillars as mobile probes for high sensitivity metrology in fluid

NASA Astrophysics Data System (ADS)

Andrich, P.; de Las Casas, C. F.; Heremans, F. J.; Awschalom, D. D.; Aleman, B. J.; Ohno, K.; Lee, J. C.; Hu, E. L.

2015-03-01

The nitrogen-vacancy (NV) center`s optical addressability and exceptional spin coherence properties at room temperature, along with diamond`s biocompatibility, has put this defect at the frontier of metrology applications in biological environments. To push the spatial resolution to the nanoscale, extensive research efforts focus on using NV centers embedded in nanodiamonds (NDs). However, this approach has been hindered by degraded spin coherence properties in NDs and the lack of a platform for spatial control of the nanoparticles in fluid. In this work, we combine the use of high quality diamond membranes with a top-down patterning technique to fabricate diamond nanoparticles with engineered and highly reproducible shape, size, and NV center density. We obtain NDs, easily releasable from the substrate into a water suspension, which contain single NV centers exhibiting consistently long spin coherence times (up to 700 μs). Additionally, we demonstrate highly stable, three-dimensional optical trapping of the nanoparticles within a microfluidic circuit. This level of control enables a bulk-like DC magnetic sensitivity and gives access to dynamical decoupling techniques on contactless, miniaturized diamond probes. This work was supported by DARPA, AFOSR, and the DIAMANT program.

A Study on Performance and Safety Tests of Electrosurgical Equipment

PubMed Central

Tavakoli Golpaygani, A.; Movahedi, M.M.; Reza, M.

2016-01-01

Introduction: Modern medicine employs a wide variety of instruments with different physiological effects and measurements. Periodic verifications are routinely used in legal metrology for industrial measuring instruments. The correct operation of electrosurgical generators is essential to ensure patient’s safety and management of the risks associated with the use of high and low frequency electrical currents on human body. Material and Methods: The metrological reliability of 20 electrosurgical equipment in six hospitals (3 private and 3 public) was evaluated in one of the provinces of Iran according to international and national standards. Results: The achieved results show that HF leakage current of ground-referenced generators are more than isolated generators and the power analysis of only eight units delivered acceptable output values and the precision in the output power measurements was low. Conclusion: Results indicate a need for new and severe regulations on periodic performance verifications and medical equipment quality control program especially in high risk instruments. It is also necessary to provide training courses for operating staff in the field of meterology in medicine to be acquianted with critical parameters to get accuracy results with operation room equipment. PMID:27853725

Sandia technology & entrepreneurs improve Lasik

ScienceCinema

Neal, Dan; Turner, Tim

2018-05-11

Former Sandian Dan Neal started his company, WaveFront Sciences, based on wavefront sensing metrology technologies licensed from Sandia National Laboratories and by taking advantage of its Entrepreneurial Separation to Transfer Technology (ESTT) program. Abbott Medical Optics since acquired WaveFront and estimates that one million patients have improved the quality of their vision thanks to its products. ESTT is a valuable tool which allows Sandia to transfer technology to the private sector and Sandia employees to leave the Labs in order to start up new technology companies or help expand existing companies.

Sandia technology & entrepreneurs improve Lasik

DOE Office of Scientific and Technical Information (OSTI.GOV)

Neal, Dan; Turner, Tim

2013-11-21

Former Sandian Dan Neal started his company, WaveFront Sciences, based on wavefront sensing metrology technologies licensed from Sandia National Laboratories and by taking advantage of its Entrepreneurial Separation to Transfer Technology (ESTT) program. Abbott Medical Optics since acquired WaveFront and estimates that one million patients have improved the quality of their vision thanks to its products. ESTT is a valuable tool which allows Sandia to transfer technology to the private sector and Sandia employees to leave the Labs in order to start up new technology companies or help expand existing companies.

Materials Science Laboratory

NASA Technical Reports Server (NTRS)

Jackson, Dionne

2005-01-01

The NASA Materials Science Laboratory (MSL) provides science and engineering services to NASA and Contractor customers at KSC, including those working for the Space Shuttle. International Space Station. and Launch Services Programs. These services include: (1) Independent/unbiased failure analysis (2) Support to Accident/Mishap Investigation Boards (3) Materials testing and evaluation (4) Materials and Processes (M&P) engineering consultation (5) Metrology (6) Chemical analysis (including ID of unknown materials) (7) Mechanical design and fabrication We provide unique solutions to unusual and urgent problems associated with aerospace flight hardware, ground support equipment and related facilities.

NASA Metrology and Calibration, 1980

NASA Technical Reports Server (NTRS)

1981-01-01

The proceedings of the fourth annual NASA Metrology and Calibration Workshop are presented. This workshop covered (1) review and assessment of NASA metrology and calibration activities by NASA Headquarters, (2) results of audits by the Office of Inspector General, (3) review of a proposed NASA Equipment Management System, (4) current and planned field center activities, (5) National Bureau of Standards (NBS) calibration services for NASA, (6) review of NBS's Precision Measurement and Test Equipment Project activities, (7) NASA instrument loan pool operations at two centers, (8) mobile cart calibration systems at two centers, (9) calibration intervals and decals, (10) NASA Calibration Capabilities Catalog, and (11) development of plans and objectives for FY 1981. Several papers in this proceedings are slide presentations only.

Structural considerations for fabrication and mounting of the AXAF HRMA optics

NASA Technical Reports Server (NTRS)

Cohen, Lester M.; Cernoch, Larry; Mathews, Gary; Stallcup, Michael

1990-01-01

A methodology is described which minimizes optics distortion in the fabrication, metrology, and launch configuration phases. The significance of finite element modeling and breadboard testing is described with respect to performance analyses of support structures and material effects in NASA's AXAF X-ray optics. The paper outlines the requirements for AXAF performance, optical fabrication, metrology, and glass support fixtures, as well as the specifications for mirror sensitivity and the high-resolution mirror assembly. Analytical modeling of the tools is shown to coincide with grinding and polishing experiments, and is useful for designing large-area polishing and grinding tools. Metrological subcomponents that have undergone initial testing show evidence of meeting force requirements.

Freeform metrology using subaperture stitching interferometry

NASA Astrophysics Data System (ADS)

Supranowitz, Chris; Lormeau, Jean-Pierre; Maloney, Chris; Murphy, Paul; Dumas, Paul

2016-11-01

As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input "hitmap" to the deterministic polishing process.

Evaluating diffraction based overlay metrology for double patterning technologies

NASA Astrophysics Data System (ADS)

Saravanan, Chandra Saru; Liu, Yongdong; Dasari, Prasad; Kritsun, Oleg; Volkman, Catherine; Acheta, Alden; La Fontaine, Bruno

2008-03-01

Demanding sub-45 nm node lithographic methodologies such as double patterning (DPT) pose significant challenges for overlay metrology. In this paper, we investigate scatterometry methods as an alternative approach to meet these stringent new metrology requirements. We used a spectroscopic diffraction-based overlay (DBO) measurement technique in which registration errors are extracted from specially designed diffraction targets for double patterning. The results of overlay measurements are compared to traditional bar-in-bar targets. A comparison between DBO measurements and CD-SEM measurements is done to show the correlation between the two approaches. We discuss the total measurement uncertainty (TMU) requirements for sub-45 nm nodes and compare TMU from the different overlay approaches.

History of reference materials for food and nutrition metrology: As represented in the series of BERM Symposia

USDA-ARS?s Scientific Manuscript database

Establishment of a metrology-based measurement system requires the solid foundation of traceability of measurements to available, appropriate certified reference materials (CRM). In the early 1970s the first “biological” Reference Material (RM) of Bowens Kale, Orchard Leaves, and Bovine Liver from ...

Nuclear Technology. Course 27: Metrology. Module 27-5, Tolerancing.

ERIC Educational Resources Information Center

Selleck, Ben; Espy, John

This fifth in a series of eight modules for a course titled Metrology describes the application of the American National Standard (ANSI Y14.5-1973) for dimensioning and tolerancing and gives guidance on interpreting form and location controls consistent with the national standard. The module follows a typical format that includes the following…

Cultural capital as a measurand

NASA Astrophysics Data System (ADS)

Taymanov, R.; Sapozhnikova, K.

2016-11-01

The necessity for developing metrology due to extension of its application sphere is noted. The efficiency of the metrological approach to measurement of multidimensional quantities in the field of humanities is shown using the development of cultural capital interpreted by L. Harrison. The cultural capital is defined as a measure of the society structure complexity and adaptive capacity.

Development of the metrology and imaging of cellulose nanocrystals

Treesearch

Michael T. Postek; Andras Vladar; John Dagata; Natalia Farkas; Bin Ming; Ryan Wagner; Arvind Raman; Robert J. Moon; Ronald Sabo; Theodore H. Wegner; James Beecher

2011-01-01

The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNCs) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science. Even the largest trees owe their strength to this newly appreciated class of nanomaterials. Cellulose is the...

The Remarkable Metrological History of Radiocarbon Dating [II].

PubMed

Currie, Lloyd A

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought (14)C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for "molecular dating" at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the "bomb effect," that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural (14)C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications.

A laser scanning system for metrology and viewing in ITER

DOE Office of Scientific and Technical Information (OSTI.GOV)

Spampinato, P.T.; Barry, R.E.; Menon, M.M.

1996-05-01

The construction and operation of a next-generation fusion reactor will require metrology to achieve and verify precise alignment of plasma-facing components and inspection in the reactor vessel. The system must be compatible with the vessel environment of high gamma radiation (10{sup 4} Gy/h), ultra-high-vacuum (10{sup {minus}8} torr), and elevated temperature (200 C). The high radiation requires that the system be remotely deployed. A coherent frequency modulated laser radar-based system will be integrated with a remotely operated deployment mechanism to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics tomore » the laser source and imaging units that are located outside of a biological shield. The deployment mechanism will be a mast-like positioning system. Radiation-damage tests will be conducted on critical sensor components at Oak Ridge National Laboratory to determine threshold damage levels and effects on data transmission. This paper identifies the requirements for International Thermonuclear Experimental Reactor metrology and viewing and describes a remotely operated precision ranging and surface mapping system.« less

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform

PubMed Central

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-01-01

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform’s mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument’s working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform. PMID:27869722

The future of 2D metrology for display manufacturing

NASA Astrophysics Data System (ADS)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

The Remarkable Metrological History of Radiocarbon Dating [II

PubMed Central

Currie, Lloyd A.

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought 14C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for “molecular dating” at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the “bomb effect,” that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural 14C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications. PMID:27366605

Understanding Imaging and Metrology with the Helium Ion Microscope

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladár, András E.; Ming, Bin

2009-09-01

One barrier to innovation confronting all phases of nanotechnology is the lack of accurate metrology for the characterization of nanomaterials. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current microscope technology is being pushed to its limits. The scanning and transmission electron microscopes have incrementally improved in performance and other scanned probe technologies such as atomic force microscopy, scanning tunneling microscopy and focused ion beam microscopes have all been applied to nanotechnology with various levels of success. A relatively new tool for nanotechnology is the scanning helium ion microscope (HIM). The HIM is a new complementary imaging and metrology technology for nanotechnology which may be able to push the current resolution barrier lower. But, successful imaging and metrology with this instrument entails new ion beam/specimen interaction physics which must be fully understood. As a new methodology, HIM is beginning to show promise and the abundance of potentially advantageous applications for nanotechnology have yet to be fully exploited. This presentation will discuss some of the progress made at NIST in understanding the science behind this new technique.

Quantitative optical metrology with CMOS cameras

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Kolenovic, Ervin; Ferguson, Curtis F.

2004-08-01

Recent advances in laser technology, optical sensing, and computer processing of data, have lead to the development of advanced quantitative optical metrology techniques for high accuracy measurements of absolute shapes and deformations of objects. These techniques provide noninvasive, remote, and full field of view information about the objects of interest. The information obtained relates to changes in shape and/or size of the objects, characterizes anomalies, and provides tools to enhance fabrication processes. Factors that influence selection and applicability of an optical technique include the required sensitivity, accuracy, and precision that are necessary for a particular application. In this paper, sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography (OEH) based on CMOS cameras, are discussed. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gauges, demonstrating the applicability of CMOS cameras in quantitative optical metrology techniques. It is shown that the advanced nature of CMOS technology can be applied to challenging engineering applications, including the study of rapidly evolving phenomena occurring in MEMS and micromechatronics.

Linear Optical Quantum Metrology with Single Photons: Exploiting Spontaneously Generated Entanglement to Beat the Shot-Noise Limit

NASA Astrophysics Data System (ADS)

Motes, Keith R.; Olson, Jonathan P.; Rabeaux, Evan J.; Dowling, Jonathan P.; Olson, S. Jay; Rohde, Peter P.

2015-05-01

Quantum number-path entanglement is a resource for supersensitive quantum metrology and in particular provides for sub-shot-noise or even Heisenberg-limited sensitivity. However, such number-path entanglement has been thought to be resource intensive to create in the first place—typically requiring either very strong nonlinearities, or nondeterministic preparation schemes with feedforward, which are difficult to implement. Very recently, arising from the study of quantum random walks with multiphoton walkers, as well as the study of the computational complexity of passive linear optical interferometers fed with single-photon inputs, it has been shown that such passive linear optical devices generate a superexponentially large amount of number-path entanglement. A logical question to ask is whether this entanglement may be exploited for quantum metrology. We answer that question here in the affirmative by showing that a simple, passive, linear-optical interferometer—fed with only uncorrelated, single-photon inputs, coupled with simple, single-mode, disjoint photodetection—is capable of significantly beating the shot-noise limit. Our result implies a pathway forward to practical quantum metrology with readily available technology.

In-line height profiling metrology sensor for zero defect production control

NASA Astrophysics Data System (ADS)

Snel, Rob; Winters, Jasper; Liebig, Thomas; Jonker, Wouter

2017-06-01

Contemporary production systems of mechanical precision parts show challenges as increased complexity, tolerances shrinking to sub-microns and yield losses that must be mastered to the extreme. More advanced automation and process control is required to accomplish this task. Often a solution based on feedforward/feedback control is chosen requiring innovative and more advanced in line metrology. This article concentrates first on the context of in line metrology for process control and then on the development of a specific in line height profiling sensor. The novel sensor technology is based on full field time domain white light interferometry which is well know from the quality lab. The novel metrology system is to be mounted close to the production equipment, as required to minimize time delay in the control loop, and is thereby fully exposed to vibrations. This sensor is innovated to perform in line with an orders of magnitude faster throughput than laboratory instruments; it's robust to withstand the rigors of workshops and has a height resolution that is in the nanometer range.

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform.

PubMed

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-11-18

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform's mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument's working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform.

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

NASA Astrophysics Data System (ADS)

Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

2017-03-01

On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

Flexible resources for quantum metrology

NASA Astrophysics Data System (ADS)

Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

2017-06-01

Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

CONFERENCE NOTE: European Optical Society, Topical Meeting Optical Metrology and Nanotechnology, Engelberg, Switzerland, 27 30 March 1994

NASA Astrophysics Data System (ADS)

1993-01-01

This meeting, organized by the Paul Scherrer Institute's Department of Applied Solid State Physics, will be held from 27 30 March 1994 at the Hotel Regina-Titlis, Engelberg, Switzerland. The aim is to bring together scientists from two important fields of current research and increasing industrial relevance. Optical metrology is a traditional discipline of applied optics which reached the nanometre scale a long time ago. Nanotechnology is setting new limits and represents a major challenge to metrology, as well as offering new opportunities to optics. The meeting is intended to help define a common future for optical metrology and nanotechnology. Topics to be covered include: nanometre position control and measuring techniques ultrahigh precision interferometry scanning probe microscopy (AFM, SNOM, etc.) surface modification by scanning probe methods precision surface fabrication and characterization nanolithography micro-optics, diffractive optics components, including systems and applications subwavelength optical structures synthetic optical materials structures and technologies for X-ray optics. For further information please contact: Jens Gobrecht (Secretary), Paul Scherrer Institute, CH-5232 Villigen-PSI, Switzerland.Tel. (41)56992529; Fax (41) 5698 2635.

Linear optical quantum metrology with single photons: exploiting spontaneously generated entanglement to beat the shot-noise limit.

PubMed

Motes, Keith R; Olson, Jonathan P; Rabeaux, Evan J; Dowling, Jonathan P; Olson, S Jay; Rohde, Peter P

2015-05-01

Quantum number-path entanglement is a resource for supersensitive quantum metrology and in particular provides for sub-shot-noise or even Heisenberg-limited sensitivity. However, such number-path entanglement has been thought to be resource intensive to create in the first place--typically requiring either very strong nonlinearities, or nondeterministic preparation schemes with feedforward, which are difficult to implement. Very recently, arising from the study of quantum random walks with multiphoton walkers, as well as the study of the computational complexity of passive linear optical interferometers fed with single-photon inputs, it has been shown that such passive linear optical devices generate a superexponentially large amount of number-path entanglement. A logical question to ask is whether this entanglement may be exploited for quantum metrology. We answer that question here in the affirmative by showing that a simple, passive, linear-optical interferometer--fed with only uncorrelated, single-photon inputs, coupled with simple, single-mode, disjoint photodetection--is capable of significantly beating the shot-noise limit. Our result implies a pathway forward to practical quantum metrology with readily available technology.

EDITORIAL: Metrological Aspects of Accelerator Technology and High Energy Physics Experiments

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.; Pozniak, Krzysztof T.

2007-08-01

The subject of this special feature in Measurement Science and Technology concerns measurement methods, devices and subsystems, both hardware and software aspects, applied in large experiments of high energy physics (HEP) and superconducting RF accelerator technology (SRF). These experiments concern mainly the physics of elementary particles or the building of new machines and detectors. The papers present practical examples of applied solutions in large, contemporary, international research projects such as HERA, LHC, FLASH, XFEL, ILC and others. These machines are unique in their global scale and consist of extremely dedicated apparatus. The apparatus is characterized by very large dimensions, a considerable use of resources and a high level of overall technical complexity. They possess a large number of measurement channels (ranging from thousands to over 100 million), are characterized by fast of processing of measured data and high measurement accuracies, and work in quite adverse environments. The measurement channels cooperate with a large number of different sensors of momenta, energies, trajectories of elementary particles, electron, proton and photon beam profiles, accelerating fields in resonant cavities, and many others. The provision of high quality measurement systems requires the designers to use only the most up-to-date technical solutions, measurement technologies, components and devices. Research work in these demanding fields is a natural birthplace of new measurement methods, new data processing and acquisition algorithms, complex, networked measurement system diagnostics and monitoring. These developments are taking place in both hardware and software layers. The chief intention of this special feature is that the papers represent equally some of the most current metrology research problems in HEP and SRF. The accepted papers have been divided into four topical groups: superconducting cavities (4 papers), low level RF systems (8 papers), ionizing radiation (5 papers) and HEP experiments (8 papers). The editors would like to thank cordially all the authors who accepted our invitation to present their very recent results. A number of authors of the papers in this issue are active in the 6th European Framework Research Program CARE—Coordinated Accelerators Research in Europe and ELAN—the European Linear Accelerator Network. Some authors are active in research programs of a global extent such as the LHC, ILC and GDE—the Global Design Effort for the International Linear Collider. We also would like to thank personally, as well as on behalf of all the authors, the Editorial Board of Measurement Science and Technology for accepting this very exciting field of contemporary metrology. This field seems to be really a birthplace of a host of new metrological technologies, where the driving force is the incredibly high technical requirements that must soon be fulfilled if we dream of building new accelerators for elementary particles, new biological materials and medicine alike. Special thanks are due to Professor R S Jachowicz of Warsaw University of Technology for initiating this issue and for continuous support and advice during our work.

Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Assoufid, L.; Rommeveaux, A.; Ohashi, H.

2005-01-01

This paper presents the first series of round-robin metrology measurements of x-ray mirrors organized at the Advanced Photon Source (APS) in the USA, the European Synchrotron Radiation Facility in France, and the Super Photon Ring (SPring-8) (in a collaboration with Osaka University, ) in Japan. This work is part of the three institutions' three-way agreement to promote a direct exchange of research information and experience amongst their specialists. The purpose of the metrology round robin is to compare the performance and limitations of the instrumentation used at the optical metrology laboratories of these facilities and to set the basis formore » establishing guidelines and procedures to accurately perform the measurements. The optics used in the measurements were selected to reflect typical, as well as state of the art, in mirror fabrication. The first series of the round robin measurements focuses on flat and cylindrical mirrors with varying sizes and quality. Three mirrors (two flats and one cylinder) were successively measured using long trace profilers. Although the three facilities' LTPs are of different design, the measurements were found to be in excellent agreement. The maximum discrepancy of the rms slope error values is 0.1 {micro}rad, that of the rms shape error was 3 nm, and they all relate to the measurement of the cylindrical mirror. The next round-robin measurements will deal with elliptical and spherical optics.« less

Subaperture metrology technologies extend capabilities in optics manufacturing

NASA Astrophysics Data System (ADS)

Tricard, Marc; Forbes, Greg; Murphy, Paul

2005-10-01

Subaperture polishing technologies have radically changed the landscape of precision optics manufacturing and enabled the production of higher precision optics with increasingly difficult figure requirements. However, metrology is a critical piece of the optics fabrication process, and the dependence on interferometry is especially acute for computer-controlled, deterministic finishing. Without accurate full-aperture metrology, figure correction using subaperture polishing technologies would not be possible. QED Technologies has developed the Subaperture Stitching Interferometer (SSI) that extends the effective aperture and dynamic range of a phase measuring interferometer. The SSI's novel developments in software and hardware improve the capacity and accuracy of traditional interferometers, overcoming many of the limitations previously faced. The SSI performs high-accuracy automated measurements of spheres, flats, and mild aspheres up to 200 mm in diameter by stitching subaperture data. The system combines a six-axis precision workstation, a commercial Fizeau interferometer of 4" or 6" aperture, and dedicated software. QED's software automates the measurement design, data acquisition, and mathematical reconstruction of the full-aperture phase map. The stitching algorithm incorporates a general framework for compensating several types of errors introduced by the interferometer and stage mechanics. These include positioning errors, viewing system distortion, the system reference wave error, etc. The SSI has been proven to deliver the accurate and flexible metrology that is vital to precision optics fabrication. This paper will briefly review the capabilities of the SSI as a production-ready, metrology system that enables costeffective manufacturing of precision optical surfaces.

The MeteoMet2 project—highlights and results

NASA Astrophysics Data System (ADS)

Merlone, A.; Sanna, F.; Beges, G.; Bell, S.; Beltramino, G.; Bojkovski, J.; Brunet, M.; del Campo, D.; Castrillo, A.; Chiodo, N.; Colli, M.; Coppa, G.; Cuccaro, R.; Dobre, M.; Drnovsek, J.; Ebert, V.; Fernicola, V.; Garcia-Benadí, A.; Garcia-Izquierdo, C.; Gardiner, T.; Georgin, E.; Gonzalez, A.; Groselj, D.; Heinonen, M.; Hernandez, S.; Högström, R.; Hudoklin, D.; Kalemci, M.; Kowal, A.; Lanza, L.; Miao, P.; Musacchio, C.; Nielsen, J.; Nogueras-Cervera, M.; Oguz Aytekin, S.; Pavlasek, P.; de Podesta, M.; Rasmussen, M. K.; del-Río-Fernández, J.; Rosso, L.; Sairanen, H.; Salminen, J.; Sestan, D.; Šindelářová, L.; Smorgon, D.; Sparasci, F.; Strnad, R.; Underwood, R.; Uytun, A.; Voldan, M.

2018-02-01

Launched in 2011 within the European Metrology Research Programme (EMRP) of EURAMET, the joint research project ‘MeteoMet’—Metrology for Meteorology—is the largest EMRP consortium; national metrology institutes, universities, meteorological and climate agencies, research institutes, collaborators and manufacturers are working together, developing new metrological techniques, as well as improving existing ones, for use in meteorological observations and climate records. The project focuses on humidity in the upper and surface atmosphere, air temperature, surface and deep-sea temperatures, soil moisture, salinity, permafrost temperature, precipitation, and the snow albedo effect on air temperature. All tasks are performed using a rigorous metrological approach and include the design and study of new sensors, new calibration facilities, the investigation of sensor characteristics, improved techniques for measurements of essential climate variables with uncertainty evaluation, traceability, laboratory proficiency and the inclusion of field influencing parameters, long-lasting measurements, and campaigns in remote and extreme areas. The vision for MeteoMet is to take a step further towards establishing full data comparability, coherency, consistency, and long-term continuity, through a comprehensive evaluation of the measurement uncertainties for the quantities involved in the global climate observing systems and the derived observations. The improvement in quality of essential climate variables records, through the inclusion of measurement uncertainty budgets, will also highlight possible strategies for the reduction of the uncertainty. This contribution presents selected highlights of the MeteoMet project and reviews the main ongoing activities, tasks and deliverables, with a view to its possible future evolution and extended impact.

Reference metrology in a research fab: the NIST clean calibrations thrust

NASA Astrophysics Data System (ADS)

Dixson, Ronald; Fu, Joe; Orji, Ndubuisi; Renegar, Thomas; Zheng, Alan; Vorburger, Theodore; Hilton, Al; Cangemi, Marc; Chen, Lei; Hernandez, Mike; Hajdaj, Russell; Bishop, Michael; Cordes, Aaron

2009-03-01

In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) - a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab - a 1765 m2 (19,000 ft2) clean room with 743 m2 (8000 ft2) of class 100 space - is the anchor of this facility and an integral component of the new Center for Nanoscale Science and Technology (CNST) at NIST. Although the CNST/NanoFab is a nanotechnology research facility with a different strategic focus than a current high volume semiconductor fab, metrology tools still play an important role in the nanofabrication research conducted here. Some of the metrology tools available to users of the NanoFab include stylus profiling, scanning electron microscopy (SEM), and atomic force microscopy (AFM). Since 2001, NIST has collaborated with SEMATECH to implement a reference measurement system (RMS) using critical dimension atomic force microscopy (CD-AFM). NIST brought metrology expertise to the table and SEMATECH provided access to leading edge metrology tools in their clean room facility in Austin. Now, in the newly launched "clean calibrations" thrust at NIST, we are implementing the reference metrology paradigm on several tools in the CNST/NanoFab. Initially, we have focused on calibration, monitoring, and uncertainty analysis for a three-tool set consisting of a stylus profiler, an SEM, and an AFM. Our larger goal is the development of new and supplemental calibrations and standards that will benefit from the Class 100 environment available in the NanoFab and offering our customers calibration options that do not require exposing their samples to less clean environments. Toward this end, we have completed a preliminary evaluation of the performance of these instruments. The results of these evaluations suggest that the achievable uncertainties are generally consistent with our measurement goals.

Correlation methods in optical metrology with state-of-the-art x-ray mirrors

NASA Astrophysics Data System (ADS)

Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

2018-01-01

The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of <100 nrad (root-mean-square) and height error of <1-2 nm (peak-tovalley). These are for optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

Enabling optical metrology on small 5×5μm2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes

NASA Astrophysics Data System (ADS)

Salerno, Antonio; de la Fuente, Isabel; Hsu, Zack; Tai, Alan; Chang, Hammer; McNamara, Elliott; Cramer, Hugo; Li, Daoping

2018-03-01

In next generation Logic devices, overlay control requirements shrink to sub 2.5nm level on-product overlay. Historically on-product overlay has been defined by the overlay capability of after-develop in-scribe targets. However, due to design and dimension, the after development metrology targets are not completely representative for the final overlay of the device. In addition, they are confined to the scribe-lane area, which limits the sampling possibilities. To address these two issues, metrology on structures matching the device structure and which can be sampled with high density across the device is required. Conventional after-etch CDSEM techniques on logic devices present difficulties in discerning the layers of interest, potential destructive charging effects and finally, they are limited by the long measurement times[1] [2] [3] . All together, limit the sampling densities and making CDSEM less attractive for control applications. Optical metrology can overcome most of these limitations. Such measurement, however, does require repetitive structures. This requirement is not fulfilled by logic devices, as the features vary in pitch and CD over the exposure field. The solution is to use small targets, with a maximum pad size of 5x5um2 , which can easily be placed in the logic cell area. These targets share the process and architecture of the device features of interest, but with a modified design that replicates as close as possible the device layout, allowing for in-device metrology for both CD and Overlay. This solution enables measuring closer to the actual product feature location and, not being limited to scribe-lanes, it opens the possibility of higher-density sampling schemes across the field. In summary, these targets become the facilitator of in-device metrology (IDM), that is, enabling the measurements both in-device Overlay and the CD parameters of interest and can deliver accurate, high-throughput, dense and after-etch measurements for Logic. Overlay improvements derived from a high-densely sampled Overlay map measured with 5x5 um2 In Device Metrology (IDM) targets were investigated on a customer Logic application. In this work we present both the main design aspects of the 5x5 um2 IDM targets, as well as the results on the improved Overlay performance.

Emergency radiobioassay preparedness exercises through the NIST radiochemistry intercomparison program.

PubMed

Nour, Svetlana; LaRosa, Jerry; Inn, Kenneth G W

2011-08-01

The present challenge for the international emergency radiobioassay community is to analyze contaminated samples rapidly while maintaining high quality results. The National Institute of Standards and Technology (NIST) runs a radiobioassay measurement traceability testing program to evaluate the radioanalytical capabilities of participating laboratories. The NIST Radiochemistry Intercomparison Program (NRIP) started more than 10 years ago, and emergency performance testing was added to the program seven years ago. Radiobioassay turnaround times under the NRIP program for routine production and under emergency response scenarios are 60 d and 8 h, respectively. Because measurement accuracy and sample turnaround time are very critical in a radiological emergency, response laboratories' analytical systems are best evaluated and improved through traceable Performance Testing (PT) programs. The NRIP provides participant laboratories with metrology tools to evaluate their performance and to improve it. The program motivates the laboratories to optimize their methodologies and minimize the turnaround time of their results. Likewise, NIST has to make adjustments and periodical changes in the bioassay test samples in order to challenge the participating laboratories continually. With practice, radioanalytical measurements turnaround time can be reduced to 3-4 h.

75 FR 25294 - Notice Pursuant to the National Cooperative Research and Production Act of 1993-High Definition...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-05-07

... DEPARTMENT OF JUSTICE Antitrust Division Notice Pursuant to the National Cooperative Research and Production Act of 1993--High Definition Metrology and Process-2 Micron Manufacturing Under ATP Award No... Metrology and Process-2 Micron Manufacturing under ATP Award No. 70NANB7H7041 has filed written...

Signal processing for order 10 pm accuracy displacement metrology in real-world scientific applications

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Loya, Frank M.

2004-01-01

This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

Fundamental Principles of Coherent-Feedback Quantum Control

DTIC Science & Technology

2014-12-08

in metrology (acceleration sensing, vibrometry, gravity wave detection) and in quantum information processing (continuous-variables quantum ...AFRL-OSR-VA-TR-2015-0009 FUNDAMENTAL PRINCIPLES OF COHERENT-FEEDBACK QUANTUM CONTROL Hideo Mabuchi LELAND STANFORD JUNIOR UNIV CA Final Report 12/08...foundations and potential applications of coherent-feedback quantum control. We have focused on potential applications in quantum -enhanced metrology and

77 FR 25406 - Consortium on “Concrete Rheology: Enabling Metrology (CREME)”: Membership Fee Update

Federal Register 2010, 2011, 2012, 2013, 2014

2012-04-30

... Technology (NIST) published a notice of a public meeting, which was held on November 8, 2011, to explore the feasibility of establishing a NIST/Industry Consortium on Concrete Rheology: Enabling Metrology (CREME)''. The... INFORMATION CONTACT: Chiara Ferraris or Nicos Martys via email at [email protected]nist.gov ; [email protected]nist...

Parasitic light scattered by complex optical coatings: modelization and metrology

NASA Astrophysics Data System (ADS)

Zerrad, Myriam; Lequime, Michel; Liukaityte, Simona; Amra, Claude

2017-12-01

Optical components realized for space applications have to be mastered in term of parasitic light. This paper present the last improvements performed at the Institute Fresnel to predict and measure scattering losses of optical components with a special care to complex optical coatings. Agreement between numerical models and metrology is now excellent. Some examples will be presented.

Optimized Biasing of Pump Laser Diodes in a Highly Reliable Metrology Source for Long-Duration Space Missions

NASA Technical Reports Server (NTRS)

Poberezhskiy, Ilya Y; Chang, Daniel H.; Erlig, Herman

2011-01-01

Optical metrology system reliability during a prolonged space mission is often limited by the reliability of pump laser diodes. We developed a metrology laser pump module architecture that meets NASA SIM Lite instrument optical power and reliability requirements by combining the outputs of multiple single-mode pump diodes in a low-loss, high port count fiber coupler. We describe Monte-Carlo simulations used to calculate the reliability of the laser pump module and introduce a combined laser farm aging parameter that serves as a load-sharing optimization metric. Employing these tools, we select pump module architecture, operating conditions, biasing approach and perform parameter sensitivity studies to investigate the robustness of the obtained solution.

Development and integration of high straightness flexure guiding mechanisms dedicated to the METAS watt balance Mark II

NASA Astrophysics Data System (ADS)

Cosandier, F.; Eichenberger, A.; Baumann, H.; Jeckelmann, B.; Bonny, M.; Chatagny, V.; Clavel, R.

2014-04-01

There is a firm will in the metrology community to redefine the kilogram in the International System of units by linking it to a fundamental physical constant. The watt balance is a promising way to link the mass unit to the Planck constant h. At the Federal Institute of Metrology METAS a second watt balance experiment is under development. A decisive part of the METAS Mark II watt balance is the mechanical linear guiding system. The present paper discusses the development and the metrological characteristics of two guiding systems that were conceived by the Laboratoire de Systèmes Robotiques of EPFL and built using flexure mechanical elements. Integration in the new setup is also described.

Metrology applied to ultrasound characterization of trabecular bones using the AIB parameter

NASA Astrophysics Data System (ADS)

Braz, D. S.; Silva, C. E.; Alvarenga, A. V.; Junior, D. S.; Costa-Félix, R. P. B.

2016-07-01

Apparent Integrated Backscattering (AIB) presents correlation between Apparent Backscatter Transfer Function and the transducer bandwidth. Replicas of trabecular bones (cubes of 20 mm side length) created by 3D printing technique were characterized using AIB with a 2.25 MHz center frequency transducer. A mechanical scanning system was used to acquire multiple backscatter signals. An uncertainty model in measurement was proposed based on the Guide to the Expression of Uncertainty in Measurement. Initial AIB results are not metrologically reliable, presenting high measurement uncertainties (sample: 5_0.2032/AIB: -15.1 dB ± 13.9 dB). It is noteworthy that the uncertainty model proposed contributes as unprecedented way for metrological assessment of trabecular bone characterization using AIB.

Maintenance of reference standards in the field of viscosity

NASA Astrophysics Data System (ADS)

Moşulică, E. A.; Cîrneanu, I.; Constantin, N.; Rucai, V.

2018-01-01

Participation in the work of comparison in the field of viscosity, within the program conducted under the jurisdiction of ASTM (American Society for Testing and Materials), D-2 Committee, Subcommittee "Flow Properties," Newtonian Fluids) was necessary to ensure traceability of measuring unit of kinematic viscosity. Results of the comparison of the specialized participating laboratories on 4 continents, has proved annual capability of INM in the transmission unit of kinematic viscosity. Cannon Position Company in the US organizes co-operation program in the field of kinematic viscosity ASTM D 02.07. The company distributes standard substances Cannon viscosity participating laboratories and consolidate the results of the measurements. Physical-chemical laboratory has fully accepted the proposed schedule of the company Cannon. Final report of the comparison showed that in the year 2015 a number of 25 laboratories and institutes of metrology attented to the program.

Validation of Radiometric Standards for the Laboratory Calibration of Reflected-Solar Earth Observing Satellite Instruments

NASA Technical Reports Server (NTRS)

Butler, James J.; Johnson, B. Carol; Rice, Joseph P.; Brown, Steven W.; Barnes, Robert A.

2007-01-01

Historically, the traceability of the laboratory calibration of Earth-observing satellite instruments to a primary radiometric reference scale (SI units) is the responsibility of each instrument builder. For the NASA Earth Observing System (EOS), a program has been developed using laboratory transfer radiometers, each with its own traceability to the primary radiance scale of a national metrology laboratory, to independently validate the radiances assigned to the laboratory sources of the instrument builders. The EOS Project Science Office also developed a validation program for the measurement of onboard diffuse reflecting plaques, which are also used as radiometric standards for Earth-observing satellite instruments. Summarized results of these validation campaigns, with an emphasis on the current state-of-the-art uncertainties in laboratory radiometric standards, will be presented. Future mission uncertainty requirements, and possible enhancements to the EOS validation program to ensure that those uncertainties can be met, will be presented.

Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Lyons, Kevin

2007-09-01

Nanomanufacturing is the essential bridge between the discoveries of nanoscience and real world nanotech products and is the vehicle by which the Nation and the World will realize the promise of major technological innovation across a spectrum of products that will affect virtually every industrial sector. For nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, economical and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust nanomanufacturing is the development of the necessary instrumentation, metrology, and standards. Integration of the instruments, their interoperability, and appropriate information management are also critical elements that must be considered for viable nanomanufacturing. Advanced instrumentation, metrology and standards will allow the physical dimensions, properties, functionality, and purity of the materials, processes, tools, systems, products, and emissions that will constitute nanomanufacturing to be measured and characterized. This will in turn enable production to be scaleable, controllable, predictable, and repeatable to meet market needs. If a nano-product cannot be measured it cannot be manufactured; additionally if that product cannot be made safely it should not be manufactured. This presentation introduces the Instrumentation, Metrology, and Standards for Nanomanufacturing Conference at the 2007 SPIE Optics and Photonics. This conference will become the leading forum for the exchange of foundational information and discussion of instrumentation, metrology and standards which are key elements for the success of nanomanufacturing.

Efficiency improvements of offline metrology job creation

NASA Astrophysics Data System (ADS)

Zuniga, Victor J.; Carlson, Alan; Podlesny, John C.; Knutrud, Paul C.

1999-06-01

Progress of the first lot of a new design through the production line is watched very closely. All performance metrics, cycle-time, in-line measurement results and final electrical performance are critical. Rapid movement of this lot through the line has serious time-to-market implications. Having this material waiting at a metrology operation for an engineer to create a measurement job plan wastes valuable turnaround time. Further, efficient use of a metrology system is compromised by the time required to create and maintain these measurement job plans. Thus, having a method to develop metrology job plans prior to the actual running of the material through the manufacture area can significantly improve both cycle time and overall equipment efficiency. Motorola and Schlumberger have worked together to develop and test such a system. The Remote Job Generator (RJG) created job plans for new device sin a manufacturing process from an NT host or workstation, offline. This increases available system tim effort making production measurements, decreases turnaround time on job plan creation and editing, and improves consistency across job plans. Most importantly this allows job plans for new devices to be available before the first wafers of the device arrive at the tool for measurement. The software also includes a database manager which allows updates of existing job plans to incorporate measurement changes required by process changes or measurement optimization. This paper will review the result of productivity enhancements through the increased metrology utilization and decreased cycle time associated with the use of RJG. Finally, improvements in process control through better control of Job Plans across different devices and layers will be discussed.

Stochastic analysis of 1D and 2D surface topography of x-ray mirrors

NASA Astrophysics Data System (ADS)

Tyurina, Anastasia Y.; Tyurin, Yury N.; Yashchuk, Valeriy V.

2017-08-01

The design and evaluation of the expected performance of new optical systems requires sophisticated and reliable information about the surface topography for planned optical elements before they are fabricated. The problem is especially complex in the case of x-ray optics, particularly for the X-ray Surveyor under development and other missions. Modern x-ray source facilities are reliant upon the availability of optics with unprecedented quality (surface slope accuracy < 0.1μrad). The high angular resolution and throughput of future x-ray space observatories requires hundreds of square meters of high quality optics. The uniqueness of the optics and limited number of proficient vendors makes the fabrication extremely time consuming and expensive, mostly due to the limitations in accuracy and measurement rate of metrology used in fabrication. We discuss improvements in metrology efficiency via comprehensive statistical analysis of a compact volume of metrology data. The data is considered stochastic and a new statistical model called Invertible Time Invariant Linear Filter (InTILF) is developed now for 2D surface profiles to provide compact description of the 2D data additionally to 1D data treated so far. The model captures faint patterns in the data and serves as a quality metric and feedback to polishing processes, avoiding high resolution metrology measurements over the entire optical surface. The modeling, implemented in our Beatmark software, allows simulating metrology data for optics made by the same vendor and technology. The forecast data is vital for reliable specification for optical fabrication, to be exactly adequate for the required system performance.

Writing next-generation display photomasks

NASA Astrophysics Data System (ADS)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

Recent years have seen a fast technical development within the display area. Displays get ever higher pixel density and the pixels get smaller. Current displays have over 800 PPI and market forces will eventually drive for densities of 2000 PPI or higher. The transistor backplanes also get more complex. OLED displays require 4-7 transistors per pixel instead of the typical 1-2 transistors used for LCDs, and they are significantly more sensitive to errors. New large-area maskwriters have been developed for masks used in high volume production of screens for state-of-theart smartphones. Redesigned laser optics with higher NA and lower aberrations improve resolution and CD uniformity and reduce mura effects. The number of beams has been increased to maintain the throughput despite the higher writing resolution. OLED displays are highly sensitive to placement errors and registration in the writers has been improved. To verify the registration of produced masks a separate metrology system has been developed. The metrology system is self-calibrated to high accuracy. The calibration is repeatable across machines and sites using Z-correction. The repeatability of the coordinate system makes it possible to standardize the coordinate system across an entire supply chain or indeed across the entire industry. In-house metrology is a commercial necessity for high-end mask shop, but also the users of the masks, the panel makers, would benefit from having in-house metrology. It would act as the reference for their mask suppliers, give better predictive and post mortem diagnostic power for the panel process, and the metrology could be used to characterize and improve the entire production loop from data to panel.

Development of at-wavelength metrology for x-ray optics at the ALS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Yuan, Sheng

2010-07-09

The comprehensive realization of the exciting advantages of new third- and forth-generation synchrotron radiation light sources requires concomitant development of reflecting and diffractive x-ray optics capable of micro- and nano-focusing, brightness preservation, and super high resolution. The fabrication, tuning, and alignment of the optics are impossible without adequate metrology instrumentation, methods, and techniques. While the accuracy of ex situ optical metrology at the Advanced Light Source (ALS) has reached a state-of-the-art level, wavefront control on beamlines is often limited by environmental and systematic alignment factors, and inadequate in situ feedback. At ALS beamline 5.3.1, we are developing broadly applicable, high-accuracy,more » in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad slope measurement accuracy for Kirkpatrick-Baez (KB) mirrors. The at-wavelength methodology we are developing relies on a series of tests with increasing accuracy and sensitivity. Geometric Hartmann tests, performed with a scanning illuminated sub-aperture determine the wavefront slope across the full mirror aperture. Shearing interferometry techniques use coherent illumination and provide higher sensitivity wavefront measurements. Combining these techniques with high precision optical metrology and experimental methods will enable us to provide in situ setting and alignment of bendable x-ray optics to realize diffraction-limited, sub 50 nm focusing at beamlines. We describe here details of the metrology beamline endstation, the x-ray beam diagnostic system, and original experimental techniques that have already allowed us to precisely set a bendable KB mirror to achieve a focused spot size of 150 nm.« less

Diffraction based overlay re-assessed

NASA Astrophysics Data System (ADS)

Leray, Philippe; Laidler, David; D'havé, Koen; Cheng, Shaunee

2011-03-01

In recent years, numerous authors have reported the advantages of Diffraction Based Overlay (DBO) over Image Based Overlay (IBO), mainly by comparison of metrology figures of merit such as TIS and TMU. Some have even gone as far as to say that DBO is the only viable overlay metrology technique for advanced technology nodes; 22nm and beyond. Typically the only reported drawback of DBO is the size of the required targets. This severely limits its effective use, when all critical layers of a product, including double patterned layers need to be measured, and in-die overlay measurements are required. In this paper we ask whether target size is the only limitation to the adoption of DBO for overlay characterization and control, or are there other metrics, which need to be considered. For example, overlay accuracy with respect to scanner baseline or on-product process overlay control? In this work, we critically re-assess the strengths and weaknesses of DBO for the applications of scanner baseline and on-product process layer overlay control. A comprehensive comparison is made to IBO. For on product process layer control we compare the performance on critical process layers; Gate, Contact and Metal. In particularly we focus on the response of the scanner to the corrections determined by each metrology technique for each process layer, as a measure of the accuracy. Our results show that to characterize an overlay metrology technique that is suitable for use in advanced technology nodes requires much more than just evaluating the conventional metrology metrics of TIS and TMU.

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

Nuclear Technology. Course 27: Metrology. Module 27-4, Angle Measurement Instruments, Optical Projections and Surface Texture Gages.

ERIC Educational Resources Information Center

Selleck, Ben; Espy, John

This fourth in a series of eight modules for a course titled Metrology describes the universal bevel protractor and the sine bar, the engineering microscope and optical projector, and several types of surface texture gages. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3)…

Metrological Traceability in the Social Sciences: A Model from Reading Measurement

NASA Astrophysics Data System (ADS)

Stenner, A. Jackson; Fisher, William P., Jr.

2013-09-01

The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia.

77 FR 6586 - GE Oil & Gas Operations, LLC Including On-Site Leased Workers From Adecco, Argus Technical, Inc...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-02-08

..., LLC Including On-Site Leased Workers From Adecco, Argus Technical, Inc., Fox Valley Metrology URS Corp... the certification for workers of the subject firm. New information shows that workers leased from Fox... from Fox Valley Metrology, URS Corp. and CompuCom working on-site at the Oshkosh, Wisconsin location of...

Quantum Communications Systems

DTIC Science & Technology

2012-09-21

metrology practical. The strategy was to develop robust photonic quantum states and sensors serving as an archetype for loss-tolerant information...communications and metrology. Our strategy consisted of developing robust photonic quantum states and sensors serving as an archetype for loss-tolerant...developed atomic memories in caesium vapour, based on a stimulated Raman transition, that have demonstrated a TBP greater than 1000 and are uniquely suited

Metrological approach to quantitative analysis of clinical samples by LA-ICP-MS: A critical review of recent studies.

PubMed

Sajnóg, Adam; Hanć, Anetta; Barałkiewicz, Danuta

2018-05-15

Analysis of clinical specimens by imaging techniques allows to determine the content and distribution of trace elements on the surface of the examined sample. In order to obtain reliable results, the developed procedure should be based not only on the properly prepared sample and performed calibration. It is also necessary to carry out all phases of the procedure in accordance with the principles of chemical metrology whose main pillars are the use of validated analytical methods, establishing the traceability of the measurement results and the estimation of the uncertainty. This review paper discusses aspects related to sampling, preparation and analysis of clinical samples by laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with emphasis on metrological aspects, i.e. selected validation parameters of the analytical method, the traceability of the measurement result and the uncertainty of the result. This work promotes the introduction of metrology principles for chemical measurement with emphasis to the LA-ICP-MS which is the comparative method that requires studious approach to the development of the analytical procedure in order to acquire reliable quantitative results. Copyright © 2018 Elsevier B.V. All rights reserved.

Surface slope metrology of highly curved x-ray optics with an interferometric microscope

NASA Astrophysics Data System (ADS)

Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

2017-09-01

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Quantum metrology with a transmon qutrit

NASA Astrophysics Data System (ADS)

Shlyakhov, A. R.; Zemlyanov, V. V.; Suslov, M. V.; Lebedev, A. V.; Paraoanu, G. S.; Lesovik, G. B.; Blatter, G.

2018-02-01

Making use of coherence and entanglement as metrological quantum resources allows us to improve the measurement precision from the shot-noise or quantum limit to the Heisenberg limit. Quantum metrology then relies on the availability of quantum engineered systems that involve controllable quantum degrees of freedom which are sensitive to the measured quantity. Sensors operating in the qubit mode and exploiting their coherence in a phase-sensitive measurement have been shown to approach the Heisenberg scaling in precision. Here, we show that this result can be further improved by operating the quantum sensor in the qudit mode, i.e., by exploiting d rather than two levels. Specifically, we describe the metrological algorithm for using a superconducting transmon device operating in a qutrit mode as a magnetometer. The algorithm is based on the base-3 semiquantum Fourier transformation and enhances the quantum theoretical performance of the sensor by a factor of 2. Even more, the practical gain of our qutrit implementation is found in a reduction of the number of iteration steps of the quantum Fourier transformation by the factor ln(2 )/ln(3 )≈0.63 compared to the qubit mode. We show that a two-tone capacitively coupled radio-frequency signal is sufficient for implementation of the algorithm.

Metrological traceability of carbon dioxide measurements in atmosphere and seawater

NASA Astrophysics Data System (ADS)

Rolle, F.; Pessana, E.; Sega, M.

2017-05-01

The accurate determination of gaseous pollutants is fundamental for the monitoring of the trends of these analytes in the environment and the application of the metrological concepts to this field is necessary to assure the reliability of the measurement results. In this work, an overview of the activity carried out at Istituto Nazionale di Ricerca Metrologica to establish the metrological traceability of the measurements of gaseous atmospheric pollutants, in particular of carbon dioxide (CO2), is presented. Two primary methods, the gravimetry and the dynamic dilution, are used for the preparation of reference standards for composition which can be used to calibrate sensors and analytical instrumentation. At present, research is carried out to lower the measurement uncertainties of the primary gas mixtures and to extend their application to the oceanic field. The reason of such investigation is due to the evidence of the changes occurring in seawater carbonate chemistry, connected to the rising level of CO2 in the atmosphere. The well established activity to assure the metrological traceability of CO2 in the atmosphere will be applied to the determination of CO2 in seawater, by developing suitable reference materials for calibration and control of the sensors during their routine use.

Relativistic Quantum Metrology: Exploiting relativity to improve quantum measurement technologies

PubMed Central

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-01-01

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects. PMID:24851858

Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

PubMed

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-05-22

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

Current state of the art in small mass and force metrology within the International System of Units

NASA Astrophysics Data System (ADS)

Shaw, Gordon A.

2018-07-01

This review article summarizes new scientific trends in research for metrology of small mass (1 mg and lower) and small force (10 micronewtons and lower). After a brief introduction to the field, this paper provides an overview of recent developments in methods that demonstrate traceability to the International System of Units (SI) with emphasis on the implications of redefining the kilogram in terms of Planck’s constant. Specific research applications include new metrology facilities, calibration of small mass and force references such as milligram to submilligram masses or atomic force microscope (AFM) cantilevers, and laser power measurement using radiation pressure forces. Also discussed are recent scientific developments that may impact the field moving forward in the study of ultrasmall forces present in trapped and cooled quantum mechanical systems, resonant micro- and nanomechanical mass sensors, and other areas that are potentially well suited for SI metrology. The work reviewed is not intended as a comprehensive review of all research in which small forces are measured, but rather as an overview of a field in which the accurate measurement of small mass and force with quantified uncertainty is the primary goal.

Kite: Status of the External Metrology Testbed for SIM

NASA Technical Reports Server (NTRS)

Dekens, Frank G.; Alvarez-Salazar, Oscar; Azizi, Alireza; Moser, Steven; Nemati, Bijan; Negron, John; Neville, Timothy; Ryan, Daniel

2004-01-01

Kite is a system level testbed for the External Metrology system of the Space Interferometry Mission (SIM). The External Metrology System is used to track the fiducial that are located at the centers of the interferometer's siderostats. The relative changes in their positions needs to be tracked to tens of picometers in order to correct for thermal measurements, the Kite testbed was build to test both the metrology gauges and out ability to optically model the system at these levels. The Kite testbed is an over-constraint system where 6 lengths are measured, but only 5 are needed to determine the system. The agreement in the over-constrained length needs to be on the order of 140 pm for the SIM Wide-Angle observing scenario and 8 pm for the Narrow-Angle observing scenario. We demonstrate that we have met the Wide-Angle goal with our current setup. For the Narrow-Angle case, we have only reached the goal for on-axis observations. We describe the testbed improvements that have been made since our initial results, and outline the future Kite changes that will add further effects that SIM faces in order to make the testbed more SIM like.

Assessing the Analytical Performance of Systems for Self-Monitoring of Blood Glucose: Concepts of Performance Evaluation and Definition of Metrological Key Terms

PubMed Central

Schnell, Oliver; Hinzmann, Rolf; Kulzer, Bernd; Freckmann, Guido; Erbach, Michael; Lodwig, Volker; Heinemann, Lutz

2013-01-01

Reliability of blood glucose (BG) measurements is a prerequisite for successful diabetes management. Publications on the evaluation of self-monitored glucose values, however, are frequently characterized by a confusion in terminology. We provide an inventory of key terms such as accuracy, trueness, precision, traceability, calibration, and matrix effect to avoid future misunderstanding. Definitions are taken from the metrological literature and international norms and explained in a language intended for nonspecialists in metrology. The terms are presented in light of the need to apply generally accepted definitions. In addition, a description of requirements and components for a sound evaluation of BG measurement systems is presented. These factors will also enable improvement in future comparisons of study results. PMID:24351185

Statistical model for speckle pattern optimization.

PubMed

Su, Yong; Zhang, Qingchuan; Gao, Zeren

2017-11-27

Image registration is the key technique of optical metrologies such as digital image correlation (DIC), particle image velocimetry (PIV), and speckle metrology. Its performance depends critically on the quality of image pattern, and thus pattern optimization attracts extensive attention. In this article, a statistical model is built to optimize speckle patterns that are composed of randomly positioned speckles. It is found that the process of speckle pattern generation is essentially a filtered Poisson process. The dependence of measurement errors (including systematic errors, random errors, and overall errors) upon speckle pattern generation parameters is characterized analytically. By minimizing the errors, formulas of the optimal speckle radius are presented. Although the primary motivation is from the field of DIC, we believed that scholars in other optical measurement communities, such as PIV and speckle metrology, will benefit from these discussions.

Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

NASA Astrophysics Data System (ADS)

Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

2018-03-01

The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

NASA Astrophysics Data System (ADS)

Fisher, William P., Jr.; Stenner, A. Jackson

2013-09-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice.

Miniaturization as a key factor to the development and application of advanced metrology systems

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Dobrev, Ivo; Harrington, Ellery; Hefti, Peter; Khaleghi, Morteza

2012-10-01

Recent technological advances of miniaturization engineering are enabling the realization of components and systems with unprecedented capabilities. Such capabilities, which are significantly beneficial to scientific and engineering applications, are impacting the development and the application of optical metrology systems for investigations under complex boundary, loading, and operating conditions. In this paper, and overview of metrology systems that we are developing is presented. Systems are being developed and applied to high-speed and high-resolution measurements of shape and deformations under actual operating conditions for such applications as sustainability, health, medical diagnosis, security, and urban infrastructure. Systems take advantage of recent developments in light sources and modulators, detectors, microelectromechanical (MEMS) sensors and actuators, kinematic positioners, rapid prototyping fabrication technologies, as well as software engineering.

3D interconnect metrology in CMS/ITRI

NASA Astrophysics Data System (ADS)

Ku, Y. S.; Shyu, D. M.; Hsu, W. T.; Chang, P. Y.; Chen, Y. C.; Pang, H. L.

2011-05-01

Semiconductor device packaging technology is rapidly advancing, in response to the demand for thinner and smaller electronic devices. Three-dimensional chip/wafer stacking that uses through-silicon vias (TSV) is a key technical focus area, and the continuous development of this novel technology has created a need for non-contact characterization. Many of these challenges are novel to the industry due to the relatively large variety of via sizes and density, and new processes such as wafer thinning and stacked wafer bonding. This paper summarizes the developing metrology that has been used during via-middle & via-last TSV process development at EOL/ITRI. While there is a variety of metrology and inspection applications for 3D interconnect processing, the main topics covered here are via CD/depth measurement, thinned wafer inspection and wafer warpage measurement.

Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

NASA Astrophysics Data System (ADS)

Park, Dong-Kiu; Kim, Hyun-Sok; Seo, Moo-Young; Ju, Jae-Wuk; Kim, Young-Sik; Shahrjerdy, Mir; van Leest, Arno; Soco, Aileen; Miceli, Giacomo; Massier, Jennifer; McNamara, Elliott; Hinnen, Paul; Böcker, Paul; Oh, Nang-Lyeom; Jung, Sang-Hoon; Chai, Yvon; Lee, Jun-Hyung

2018-03-01

This paper demonstrates the improvement using the YieldStar S-1250D small spot, high-NA, after-etch overlay in-device measurements in a DRAM HVM environment. It will be demonstrated that In-device metrology (IDM) captures after-etch device fingerprints more accurately compared to the industry-standard CDSEM. Also, IDM measurements (acquiring both CD and overlay) can be executed significantly faster increasing the wafer sampling density that is possible within a realistic metrology budget. The improvements to both speed and accuracy open the possibility of extended modeling and correction capabilities for control. The proof-book data of this paper shows a 36% improvement of device overlay after switching to control in a DRAM HVM environment using indevice metrology.

NIST display colorimeter calibration facility

NASA Astrophysics Data System (ADS)

Brown, Steven W.; Ohno, Yoshihiro

2003-07-01

A facility has been developed at the National Institute of Standards and Technology (NIST) to provide calibration services for color-measuring instruments to address the need for improving and certifying the measurement uncertainties of this type of instrument. While NIST has active programs in photometry, flat panel display metrology, and color and appearance measurements, these are the first services offered by NIST tailored to color-measuring instruments for displays. An overview of the facility, the calibration approach, and associated uncertainties are presented. Details of a new tunable colorimetric source and the development of new transfer standard instruments are discussed.

EDITORIAL: The 9th International Symposium on Measurement Science and Intelligent Instruments (ISMTII-2009) The 9th International Symposium on Measurement Science and Intelligent Instruments (ISMTII-2009)

NASA Astrophysics Data System (ADS)

Chugui, Yuri

2010-05-01

The papers for this special feature have been selected for publication after the successful measurement forum that took place in Saint Petersburg, Russia, in 2009. ISMTII-2009 presented state-of-the-art approaches and solutions in the most challenging areas and focused on microscale and nanoscale measurements and metrology; novel measurements and diagnostic technologies, including nondestructive and dimensional inspection; measurements for geometrical and mechanical quantities, terahertz technologies for science, industry and biomedicine; intelligent measuring instruments and systems for industry and transport; optical and x-ray tomography and interferometry, metrology and characterization of materials, measurements and metrology for the humanitarian fields; and education in measurement science. We believe that scientists and specialists around the world found there the newest information on measurement technology and intelligent instruments, and this will stimulate work in these areas which is an essential part of progress in measurement. The ISMTII Symposia have been held successfully every two years from 1989 in the People's Republic of China, Hungary, Egypt, Hong Kong, UK and Japan under the direction of ICMI. In 2009 the ISMTII measuring forum took place in Russia, and it is a great honour for our country, as well as for the Russian Academy of Sciences and its Siberian Branch—Novosibirsk Scientific Center. This Symposium was located in historic Saint Petersburg, which from its foundation has been a unique bridge of communication between countries on all continents, and participation provided an excellent opportunity for the exchange of experience, information and knowledge between specialists from different countries and fields. On behalf of the Organizers, Steering Committee and International Program Committee I would like to thank all the participants for their valuable contributions without which this special feature would not have become reality, as well as the reviewers for their careful evaluation of the papers. My special thanks go to the publishing team of the Measurement Science and Technology journal.

Verify Occulter Deployment Tolerances as Part of NASA's Technology Development for Exoplanet Missions

NASA Astrophysics Data System (ADS)

Kasdin, N. J.; Shaklan, S.; Lisman, D.; Thomson, M.; Webb, D.; Cady, E.; Marks, G. W.; Lo, A.

2013-01-01

In support of NASA's Exoplanet Exploration Program and the Technology Development for Exoplanet Missions (TDEM), we recently completed a 2 year study of the manufacturability and metrology of starshade petals. An external occult is a satellite employing a large screen, or starshade, that flies in formation with a spaceborne telescope to provide the starlight suppression needed for detecting and characterizing exoplanets. Among the advantages of using an occulter are the broadband allowed for characterization and the removal of light before entering the observatory, greatly relaxing the requirements on the telescope and instrument. This poster presents the results of our successful first TDEM that demonstrated an occulter petal could be built and measured to an accuracy consistent with close to 10^-10 contrast. We also present the progress in our second TDEM to demonstrate the next critical technology milestone: precision deployment of the central truss and petals to the necessary accuracy. We have completed manufacture of four sub-scale petals and a central hub to fit with an existing deployable truss. We show the plans for repeated stow and deploy tests of the assembly and the metrology to confirm that each deploy repeatably meets the absolute positioning requirements of the petals (better than 1.0 mm).

A validated near-infrared spectroscopic method for methanol detection in biodiesel

NASA Astrophysics Data System (ADS)

Paul, Andrea; Bräuer, Bastian; Nieuwenkamp, Gerard; Ent, Hugo; Bremser, Wolfram

2016-06-01

Biodiesel quality control is a relevant issue as biodiesel properties influence diesel engine performance and integrity. Within the European metrology research program (EMRP) ENG09 project ‘Metrology for Biofuels’, an on-line/at-site suitable near-infrared spectroscopy (NIRS) method has been developed in parallel with an improved EN14110 headspace gas chromatography (GC) analysis method for methanol in biodiesel. Both methods have been optimized for a methanol content of 0.2 mass% as this represents the maximum limit of methanol content in FAME according to EN 14214:2009. The NIRS method is based on a mobile NIR spectrometer equipped with a fiber-optic coupled probe. Due to the high volatility of methanol, a tailored air-tight adaptor was constructed to prevent methanol evaporation during measurement. The methanol content of biodiesel was determined from evaluation of NIRS spectra by partial least squares regression (PLS). Both GC analysis and NIRS exhibited a significant dependence on biodiesel feedstock. The NIRS method is applicable to a content range of 0.1% (m/m) to 0.4% (m/m) of methanol with uncertainties at around 6% relative for the different feedstocks. A direct comparison of headspace GC and NIRS for samples of FAMEs yielded that the results of both methods are fully compatible within their stated uncertainties.

Foundations of Metrology: Important Early Works on Weights and Measures in the Library of the National Bureau of Standards.

ERIC Educational Resources Information Center

Terner, Janet R.

The purpose of this project was to survey the National Bureau of Standards library holdings of pre-1900 works on metrology and from these, to assemble a special collection of historically important documents. The 265 imprints selected for the collection are listed in this report. Each entry includes the main author, title, imprint, and collation…

Scintillation Method of Analysis for Determination of Properties of Wear Particles in Lubricating Oils,

DTIC Science & Technology

1998-01-01

Scintillation Method of Analysis for Determination of Properties of Wear Particles in Lubricating Oils Andrey B. Alkhimov Applied Physics Insitute...lubricating oils; metrological properties ; scintillation spectral analysis; spectrometer; unit-to-unit diagnostics; wear particles. Introduction: In...filter. The use of air reduces the metrological properties of the method, but it saves the operators the trouble and expense of using argon and

Catalog of Federal metrology and calibration capabilities: 1980 edition

NASA Astrophysics Data System (ADS)

Leedy, K. O.

1980-09-01

Federal laboratories involved in metrology and calibration are listed. Included is the name of a person to contact at each laboratory telephone number and address. The capabilities of each laboratory are indicated in a tabular listing by agency. To provide geographical distribution, the laboratories are listed by States. In addition, the laboratories are shown on a map by coded number. Other references are described.

Precise Time and Time Interval (PTTI) Systems and Applications Meeting (42nd Annual) Held in Reston, Virginia on November 15-18, 2010

DTIC Science & Technology

2010-11-01

Tokyo University of Science, Japan; K. Watabe, K. Hagimoto, and T . Ikegami , National Metrology Institute of Japan Studies on an Improved...141 T . Iwata, K. Machita, T . Matsuzawa, National Institute of Advanced Industrial...285 K. Liang, National Institute of Metrology, P. R. China; T . Feldmann, A. Bauch, and D. Piester, Physikalisch

Advanced Mathematical Tools in Metrology III

NASA Astrophysics Data System (ADS)

Ciarlini, P.

The Table of Contents for the book is as follows: * Foreword * Invited Papers * The ISO Guide to the Expression of Uncertainty in Measurement: A Bridge between Statistics and Metrology * Bootstrap Algorithms and Applications * The TTRSs: 13 Oriented Constraints for Dimensioning, Tolerancing & Inspection * Graded Reference Data Sets and Performance Profiles for Testing Software Used in Metrology * Uncertainty in Chemical Measurement * Mathematical Methods for Data Analysis in Medical Applications * High-Dimensional Empirical Linear Prediction * Wavelet Methods in Signal Processing * Software Problems in Calibration Services: A Case Study * Robust Alternatives to Least Squares * Gaining Information from Biomagnetic Measurements * Full Papers * Increase of Information in the Course of Measurement * A Framework for Model Validation and Software Testing in Regression * Certification of Algorithms for Determination of Signal Extreme Values during Measurement * A Method for Evaluating Trends in Ozone-Concentration Data and Its Application to Data from the UK Rural Ozone Monitoring Network * Identification of Signal Components by Stochastic Modelling in Measurements of Evoked Magnetic Fields from Peripheral Nerves * High Precision 3D-Calibration of Cylindrical Standards * Magnetic Dipole Estimations for MCG-Data * Transfer Functions of Discrete Spline Filters * An Approximation Method for the Linearization of Tridimensional Metrology Problems * Regularization Algorithms for Image Reconstruction from Projections * Quality of Experimental Data in Hydrodynamic Research * Stochastic Drift Models for the Determination of Calibration Intervals * Short Communications * Projection Method for Lidar Measurement * Photon Flux Measurements by Regularised Solution of Integral Equations * Correct Solutions of Fit Problems in Different Experimental Situations * An Algorithm for the Nonlinear TLS Problem in Polynomial Fitting * Designing Axially Symmetric Electromechanical Systems of Superconducting Magnetic Levitation in Matlab Environment * Data Flow Evaluation in Metrology * A Generalized Data Model for Integrating Clinical Data and Biosignal Records of Patients * Assessment of Three-Dimensional Structures in Clinical Dentistry * Maximum Entropy and Bayesian Approaches to Parameter Estimation in Mass Metrology * Amplitude and Phase Determination of Sinusoidal Vibration in the Nanometer Range using Quadrature Signals * A Class of Symmetric Compactly Supported Wavelets and Associated Dual Bases * Analysis of Surface Topography by Maximum Entropy Power Spectrum Estimation * Influence of Different Kinds of Errors on Imaging Results in Optical Tomography * Application of the Laser Interferometry for Automatic Calibration of Height Setting Micrometer * Author Index

Preliminary results for mask metrology using spatial heterodyne interferometry

NASA Astrophysics Data System (ADS)

Bingham, Philip R.; Tobin, Kenneth; Bennett, Marylyn H.; Marmillion, Pat

2003-12-01

Spatial heterodyne interferometry (SHI) is an imaging technique that captures both the phase and amplitude of a complex wavefront in a single high-speed image. This technology was developed at the Oak Ridge National Laboratory (ORNL) and is currently being implemented for semiconductor wafer inspection by nLine Corporation. As with any system that measures phase, metrology and inspection of surface structures is possible by capturing a wavefront reflected from the surface. The interpretation of surface structure heights for metrology applications can become very difficult with the many layers of various materials used on semiconductor wafers, so inspection (defect detection) has been the primary focus for semiconductor wafers. However, masks used for photolithography typically only contain a couple well-defined materials opening the doors to high-speed mask metrology in 3 dimensions in addition to inspection. Phase shift masks often contain structures etched out of the transparent substrate material for phase shifting. While these structures are difficult to inspect using only intensity, the phase and amplitude images captured with SHI can produce very good resolution of these structures. The phase images also provide depth information that is crucial for these phase shift regions. Preliminary testing has been performed to determine the feasibility of SHI for high-speed non-contact mask metrology using a prototype SHI system with 532 nm wavelength illumination named the Visible Alpha Tool (VAT). These results show that prototype SHI system is capable of performing critical dimension measurements on 400nm lines with a repeatability of 1.4nm and line height measurements with a repeatability of 0.26nm. Additionally initial imaging of an alternating aperture phase shift mask has shown the ability of SHI to discriminate between typical phase shift heights.

Clean focus, dose and CD metrology for CD uniformity improvement

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Kim, Nakyoon; Robinson, John C.; Mengel, Markus; Pablo, Rovira; Yoo, Sungchul; Getin, Raphael; Choi, Dongsub; Jeon, Sanghuck

2018-03-01

Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) uniformity requires continuous improvement to meet the required CD error budget. In this study we investigate using optical measurement technology to improve over CD-SEM methods in focus, dose, and CD. One of the key challenges is measuring scanner focus of device patterns. There are focus measurement methods based on specially designed marks on scribe-line, however, one issue of this approach is that it will report focus of scribe line which is potentially different from that of the real device pattern. In addition, scribe-line marks require additional design and troubleshooting steps that add complexity. In this study, we investigated focus measurement directly on the device pattern. Dose control is typically based on using the linear correlation behavior between dose and CD. The noise of CD measurement, based on CD-SEM for example, will not only impact the accuracy, but also will make it difficult to monitor dose signature on product wafers. In this study we will report the direct dose metrology result using an optical metrology system which especially enhances the DUV spectral coverage to improve the signal to noise ratio. CD-SEM is often used to measure CD after the lithography step. This measurement approach has the advantage of easy recipe setup as well as the flexibility to measure critical feature dimensions, however, we observe that CD-SEM metrology has limitations. In this study, we demonstrate within-field CD uniformity improvement through the extraction of clean scanner slit and scan CD behavior by using optical metrology.

OPC model data collection for 45-nm technology node using automatic CD-SEM offline recipe creation

NASA Astrophysics Data System (ADS)

Fischer, Daniel; Talbi, Mohamed; Wei, Alex; Menadeva, Ovadya; Cornell, Roger

2007-03-01

Optical and Process Correction in the 45nm node is requiring an ever higher level of characterization. The greater complexity drives a need for automation of the metrology process allowing more efficient, accurate and effective use of the engineering resources and metrology tool time in the fab, helping to satisfy what seems an insatiable appetite for data by lithographers and modelers charged with development of 45nm and 32nm processes. The scope of the work referenced here is a 45nm design cycle "full-loop automation", starting with gds formatted target design layout and ending with the necessary feedback of one and two dimensional printed wafer metrology. In this paper the authors consider the key elements of software, algorithmic framework and Critical Dimension Scanning Electron Microscope (CDSEM) functionality necessary to automate its recipe creation. We evaluate specific problems with the methodology of the former art, "on-tool on-wafer" recipe construction, and discuss how the implementation of the design based recipe generation improves upon the overall metrology process. Individual target-by-target construction, use of a one pattern recognition template fits all approach, a blind navigation to the desired measurement feature, lengthy sessions on tool to construct recipes and limited ability to determine measurement quality in the resultant data set are each discussed as to how the state of the art Design Based Metrology (DBM) approach is implemented. The offline created recipes have shown pattern recognition success rates of up to 100% and measurement success rates of up to 93% for line/space as well as for 2D Minimum/Maximum measurements without manual assists during measurement.

64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

NASA Astrophysics Data System (ADS)

Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe

2015-03-01

Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.

Self care programs and multiple sclerosis: physical therapeutics treatment - literature review.

PubMed

Demaille-Wlodyka, S; Donze, C; Givron, P; Gallien, P

2011-03-01

To clarify the therapeutic education program impact with multiple sclerosis patients, literature review. Highlight contents and efficacy. A non-systematic review on Medline, PubMed and Cochrane library databases from 1966 to 2010 using the following keywords: "multiple sclerosis", "self-care", "self-management" and specific symptoms keywords. Clinical trials and randomized clinical trials, as well as literature reviews published in English, French and German will be analyzed. Counseling is a part of the non-pharmacological management of chronic illnesses such as multiple sclerosis. Symptoms' diversity and the different clinical forms limit standardized programs of self-care management, applicable to patients. In the literature review, counseling programs have often low metrology. A behavior change with patients and medical staff could exist. To empower the patient, to reduce symptoms' impact and to improve treatment access are the aims of educational therapy. Therapeutic education program for multiple sclerosis patients could progress with their standardization and assessment, for each sign. To promote the educational therapy of multiple sclerosis patients, a specific training for medical staff, as specific financing are necessary. 2011 Elsevier Masson SAS. All rights reserved.

Metrological digital audio reconstruction

DOEpatents

Fadeyev,; Vitaliy, Haber [Berkeley, CA; Carl, [Berkeley, CA

2004-02-19

Audio information stored in the undulations of grooves in a medium such as a phonograph record may be reconstructed, with little or no contact, by measuring the groove shape using precision metrology methods coupled with digital image processing and numerical analysis. The effects of damage, wear, and contamination may be compensated, in many cases, through image processing and analysis methods. The speed and data handling capacity of available computing hardware make this approach practical. Two examples used a general purpose optical metrology system to study a 50 year old 78 r.p.m. phonograph record and a commercial confocal scanning probe to study a 1920's celluloid Edison cylinder. Comparisons are presented with stylus playback of the samples and with a digitally re-mastered version of an original magnetic recording. There is also a more extensive implementation of this approach, with dedicated hardware and software.

Metrology for industrial quantum communications: the MIQC project

NASA Astrophysics Data System (ADS)

Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

2014-12-01

The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

Information systems as a tool to improve legal metrology activities

NASA Astrophysics Data System (ADS)

Rodrigues Filho, B. A.; Soratto, A. N. R.; Gonçalves, R. F.

2016-07-01

This study explores the importance of information systems applied to legal metrology as a tool to improve the control of measuring instruments used in trade. The information system implanted in Brazil has also helped to understand and appraise the control of the measurements due to the behavior of the errors and deviations of instruments used in trade, allowing the allocation of resources wisely, leading to a more effective planning and control on the legal metrology field. A study case analyzing the fuel sector is carried out in order to show the conformity of fuel dispersers according to maximum permissible errors. The statistics of measurement errors of 167,310 fuel dispensers of gasoline, ethanol and diesel used in the field were analyzed demonstrating the accordance of the fuel market in Brazil to the legal requirements.

Advanced optical manufacturing and testing; Proceedings of the Meeting, San Diego, CA, July 9-11, 1990

NASA Astrophysics Data System (ADS)

Sanger, Gregory M.; Reid, Paul B.; Baker, Lionel R.

1990-11-01

Consideration is given to advanced optical fabrication, profilometry and thin films, and metrology. Particular attention is given to automation for optics manufacturing, 3D contouring on a numerically controlled grinder, laser-scanning lens configurations, a noncontact precision measurement system, novel noncontact profiler design for measuring synchrotron radiation mirrors, laser-diode technologies for in-process metrology, measurements of X-ray reflectivities of Au-coatings at several energies, platinum coating of an X-ray mirror for SR lithography, a Hilbert transform algorithm for fringe-pattern analysis, structural error sources during fabrication of the AXAF optical elements, an in-process mirror figure qualification procedure for large deformable mirrors, interferometric evaluation of lenslet arrays for 2D phase-locked laser diode sources, and manufacturing and metrology tooling for the solar-A soft X-ray telescope.

Gloss evaluation from soft and hard metrologies.

PubMed

Wang, Zihao; Xu, Lihao; Hu, Yu; Mirjalili, Fereshteh; Luo, Ming Ronnier

2017-09-01

Recent advances in bidirectional reflectance distribution function (BRDF) acquisitions have provided a novel approach for appearance measurement and analysis. In particular, since gloss appearance is dependent on the directional reflective properties of surfaces, it is reasonable to leverage the BRDF for gloss evaluation. In this paper, we investigate gloss appearance from both soft metrology and hard metrology. A psychophysical experiment was conducted for the gloss assessment of 47 neutral-color samples. In the evaluation of gloss perception from gloss meter measurements, we report several ambiguous correspondences in the medium gloss range. In order to analyze and explain this phenomenon, the BRDF was acquired and examined using a commercial BRDF measuring device. With an improved correlation-to-visual perception, we propose a two-dimensional gloss model by combining a parameter, the standard deviation of the specular lobe, from Ward's BRDF model with measured gloss values.

The National Time and Frequency Service of the Russian Federation

DTIC Science & Technology

2004-09-01

Krutikov Gosstandard of Russia, Moscow 119991, Russia V. Kostromin and N. Koshelyaevsky Institute of Metrology for Time and Space FGUP “ VNIIFTRI ...Metrology for Time and Space FGUP VNIIFTRI Mendeleevo 141570, Russia 8. PERFORMING ORGANIZATION REPORT NUMBER 9. SPONSORING/MONITORING AGENCY NAME(S) AND...is supplied from reserved sources located in premises outside the main territory of VNIIFTRI . According to the State Traceability Chart for Time

Microwave monolithic integrated circuit-related metrology at the National Institute of Standards and Technology

NASA Astrophysics Data System (ADS)

Reeve, Gerome; Marks, Roger; Blackburn, David

1990-12-01

How the National Institute of Standards and Technology (NIST) interacts with the GaAs community and the Defense Advanced Research Projects Agency microwave monolithic integrated circuit (MMIC) initiative is described. The organization of a joint industry and government laboratory consortium for MMIC-related metrology research is described along with some of the initial technical developments at NIST done in support of the consortium.

Sub-Planck structures and Quantum Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Panigrahi, Prasanta K.; Kumar, Abhijeet; Roy, Utpal

The significance of sub-Planck structures in relation to quantum metrology is explored, in close contact with experimental setups. It is shown that an entangled cat state can enhance the accuracy of parameter estimations. The possibility of generating this state, in dissipative systems has also been demonstrated. Thereafter, the quantum Cramer-Rao bound for phase estimation through a pair coherent state is calculated, which achieves the maximum possible resolution in an interferometer.

In Situ Metrology for the Corrective Polishing of Replicating Mandrels

DTIC Science & Technology

2010-06-08

distribution is unlimited. 13. SUPPLEMENTARY NOTES Presented at Mirror Technology Days, Boulder, Colorado, USA, 7-9 June 2010. 14...ABSTRACT The International X-ray Observatory (IXO) will require mandrel metrology with extremely tight tolerances on mirrors with up to 1.6 meter radii...ideal. Error budgets for the IXO mirror segments are presented. A potential solution is presented that uses a voice-coil controlled gauging head, air

Development of Software to Model AXAF-I Image Quality

NASA Technical Reports Server (NTRS)

Ahmad, Anees; Hawkins, Lamar

1996-01-01

This draft final report describes the work performed under the delivery order number 145 from May 1995 through August 1996. The scope of work included a number of software development tasks for the performance modeling of AXAF-I. A number of new capabilities and functions have been added to the GT software, which is the command mode version of the GRAZTRACE software, originally developed by MSFC. A structural data interface has been developed for the EAL (old SPAR) finite element analysis FEA program, which is being used by MSFC Structural Analysis group for the analysis of AXAF-I. This interface utility can read the structural deformation file from the EAL and other finite element analysis programs such as NASTRAN and COSMOS/M, and convert the data to a suitable format that can be used for the deformation ray-tracing to predict the image quality for a distorted mirror. There is a provision in this utility to expand the data from finite element models assuming 180 degrees symmetry. This utility has been used to predict image characteristics for the AXAF-I HRMA, when subjected to gravity effects in the horizontal x-ray ground test configuration. The development of the metrology data processing interface software has also been completed. It can read the HDOS FITS format surface map files, manipulate and filter the metrology data, and produce a deformation file, which can be used by GT for ray tracing for the mirror surface figure errors. This utility has been used to determine the optimum alignment (axial spacing and clocking) for the four pairs of AXAF-I mirrors. Based on this optimized alignment, the geometric images and effective focal lengths for the as built mirrors were predicted to cross check the results obtained by Kodak.

Easy parallel screening of reagent stability, quality control, and metrology in solid phase peptide synthesis (SPPS) and peptide couplings for microarrays

DOE Office of Scientific and Technical Information (OSTI.GOV)

Achyuthan, Komandoor E.; Wheeler, David R.

Evaluating the stability of coupling reagents, quality control (QC), and surface functionalization metrology are all critical to the production of high quality peptide microarrays. We describe a broadly applicable screening technique for evaluating the fidelity of solid phase peptide synthesis (SPPS), the stability of activation/coupling reagents, and a microarray surface metrology tool. This technique was used to assess the stability of the activation reagent 1-{[1-(Cyano-2-ethoxy-2-oxo-ethylidenaminooxy)dimethylamino-morpholinomethylene]}methaneaminiumHexafluorophosphate (COMU) (Sigma-Aldrich, St. Louis, MO, USA) by SPPS of Leu-Enkephalin (YGGFL) or the coupling of commercially synthesized YGGFL peptides to (3-aminopropyl)triethyoxysilane-modified glass surfaces. Coupling efficiency was quantitated by fluorescence signaling based on immunoreactivity of themore » YGGFL motif. It was concluded that COMU solutions should be prepared fresh and used within 5 h when stored at ~23 °C and not beyond 24 h if stored refrigerated, both in closed containers. Caveats to gauging COMU stability by absorption spectroscopy are discussed. Commercial YGGFL peptides needed independent QC, due to immunoreactivity variations for the same sequence synthesized by different vendors. This technique is useful in evaluating the stability of other activation/coupling reagents besides COMU and as a metrology tool for SPPS and peptide microarrays.« less

Easy parallel screening of reagent stability, quality control, and metrology in solid phase peptide synthesis (SPPS) and peptide couplings for microarrays

DOE PAGES

Achyuthan, Komandoor E.; Wheeler, David R.

2015-08-27

Evaluating the stability of coupling reagents, quality control (QC), and surface functionalization metrology are all critical to the production of high quality peptide microarrays. We describe a broadly applicable screening technique for evaluating the fidelity of solid phase peptide synthesis (SPPS), the stability of activation/coupling reagents, and a microarray surface metrology tool. This technique was used to assess the stability of the activation reagent 1-{[1-(Cyano-2-ethoxy-2-oxo-ethylidenaminooxy)dimethylamino-morpholinomethylene]}methaneaminiumHexafluorophosphate (COMU) (Sigma-Aldrich, St. Louis, MO, USA) by SPPS of Leu-Enkephalin (YGGFL) or the coupling of commercially synthesized YGGFL peptides to (3-aminopropyl)triethyoxysilane-modified glass surfaces. Coupling efficiency was quantitated by fluorescence signaling based on immunoreactivity of themore » YGGFL motif. It was concluded that COMU solutions should be prepared fresh and used within 5 h when stored at ~23 °C and not beyond 24 h if stored refrigerated, both in closed containers. Caveats to gauging COMU stability by absorption spectroscopy are discussed. Commercial YGGFL peptides needed independent QC, due to immunoreactivity variations for the same sequence synthesized by different vendors. This technique is useful in evaluating the stability of other activation/coupling reagents besides COMU and as a metrology tool for SPPS and peptide microarrays.« less

Characterization of integrated optical CD for process control

NASA Astrophysics Data System (ADS)

Yu, Jackie; Uchida, Junichi; van Dommelen, Youri; Carpaij, Rene; Cheng, Shaunee; Pollentier, Ivan; Viswanathan, Anita; Lane, Lawrence; Barry, Kelly A.; Jakatdar, Nickhil

2004-05-01

The accurate measurement of CD (critical dimension) and its application to inline process control are key challenges for high yield and OEE (overall equipment efficiency) in semiconductor production. CD-SEM metrology, although providing the resolution necessary for CD evaluation, suffers from the well-known effect of resist shrinkage, making accuracy and stability of the measurements an issue. For sub-100 nm in-line process control, where accuracy and stability as well as speed are required, CD-SEM metrology faces serious limitations. In contrast, scatterometry, using broadband optical spectra taken from grating structures, does not suffer from such limitations. This technology is non-destructive and, in addition to CD, provides profile information and film thickness in a single measurement. Using Timbre's Optical Digital Profililometry (ODP) technology, we characterized the Process Window, using a iODP101 integrated optical CD metrology into a TEL Clean Track at IMEC. We demonstrate the Optical CD's high sensitivity to process change and its insensitivity to measurement noise. We demonstrate the validity of ODP modeling by showing its accurate response to known process changes built into the evaluation and its excellent correlation to CD-SEM. We will further discuss the intrinsic Optical CD metrology factors that affect the tool precision, accuracy and its correlation to CD-SEM.

Overlay improvements using a real time machine learning algorithm

NASA Astrophysics Data System (ADS)

Schmitt-Weaver, Emil; Kubis, Michael; Henke, Wolfgang; Slotboom, Daan; Hoogenboom, Tom; Mulkens, Jan; Coogans, Martyn; ten Berge, Peter; Verkleij, Dick; van de Mast, Frank

2014-04-01

While semiconductor manufacturing is moving towards the 14nm node using immersion lithography, the overlay requirements are tightened to below 5nm. Next to improvements in the immersion scanner platform, enhancements in the overlay optimization and process control are needed to enable these low overlay numbers. Whereas conventional overlay control methods address wafer and lot variation autonomously with wafer pre exposure alignment metrology and post exposure overlay metrology, we see a need to reduce these variations by correlating more of the TWINSCAN system's sensor data directly to the post exposure YieldStar metrology in time. In this paper we will present the results of a study on applying a real time control algorithm based on machine learning technology. Machine learning methods use context and TWINSCAN system sensor data paired with post exposure YieldStar metrology to recognize generic behavior and train the control system to anticipate on this generic behavior. Specific for this study, the data concerns immersion scanner context, sensor data and on-wafer measured overlay data. By making the link between the scanner data and the wafer data we are able to establish a real time relationship. The result is an inline controller that accounts for small changes in scanner hardware performance in time while picking up subtle lot to lot and wafer to wafer deviations introduced by wafer processing.

Using the Leitz LMS 2000 for monitoring and improvement of an e-beam

NASA Astrophysics Data System (ADS)

Blaesing-Bangert, Carola; Roeth, Klaus-Dieter; Ogawa, Yoichi

1994-11-01

Kaizen--a continuously improving--is a philosophy lived in Japan which is also becoming more and more important in Western companies. To implement this philosophy in the semiconductor industry, a high performance metrology tool is essential to determine the status of production quality periodically. An important prerequisite for statistical process control is the high stability of the metrology tool over several months or years; the tool-induced shift should be as small as possible. The pattern placement metrology tool Leitz LMS 2000 has been used in a major European mask house for several years now to qualify masks within the tightest specifications and to monitor the MEBES III and its cassettes. The mask shop's internal specification for the long term repeatability of the pattern placement metrology tool is 19 nm instead of 42 nm as specified by the supplier of the tool. Then the process capability of the LMS 2000 over 18 months is represented by an average cpk value of 2.8 for orthogonality, 5.2 for x-scaling, and 3.0 for y-scaling. The process capability of the MEBES III and its cassettes was improved in the past years. For instance, 100% of the masks produced with a process tolerance of +/- 200 nm are now within this limit.

Optical truss and retroreflector modeling for picometer laser metrology

NASA Astrophysics Data System (ADS)

Hines, Braden E.

1993-09-01

Space-based astrometric interferometer concepts typically have a requirement for the measurement of the internal dimensions of the instrument to accuracies in the picometer range. While this level of resolution has already been achieved for certain special types of laser gauges, techniques for picometer-level accuracy need to be developed to enable all the various kinds of laser gauges needed for space-based interferometers. Systematic errors due to retroreflector imperfections become important as soon as the retroreflector is allowed to either translate in position or articulate in angle away from its nominal zero-point. Also, when combining several laser interferometers to form a three-dimensional laser gauge (a laser optical truss), systematic errors due to imperfect knowledge of the truss geometry are important as the retroreflector translates away from its nominal zero-point. In order to assess the astrometric performance of a proposed instrument, it is necessary to determine how the effects of an imperfect laser metrology system impact the astrometric accuracy. This paper show the development of an error propagation model from errors in the 1-D metrology measurements through the impact on the overall astrometric accuracy for OSI. Simulations are then presented based on this development which were used to define a multiplier which determines the 1-D metrology accuracy required to produce a given amount of fringe position error.

Report on AFRIMETS supplementary comparison: platinum resistance thermometer and digital thermometer calibrations against ITS-90 over the range -50 °C to 450 °C (AFRIMETS.T-S1)

NASA Astrophysics Data System (ADS)

Liedberg, Hans; Abdelaziz, Yasser; Tesfaye, Fitsum; Egadwa, Wilson; Norranim, Uthai; Rwashana, Simon; Kagoma, Alphonce; Ziagi, Adam; Kwong, Christian Ng Ha; Madeleine, Gilbert

2017-01-01

A Regional Metrology Organization (RMO) supplementary comparison of platinum resistance thermometer and digital thermometer (AFRIMETS.T-S1) was carried out by the National Metrology Institute of South Africa (NMISA), National Institute for Standards Egypt (NIS), National Metrology Institute of Ethiopia (NMIE), Kenya Bureau of Standards (KEBS), National Institute of Metrology Thailand (NIMT), Uganda National Bureau of Standards (UNBS), Tanzania Bureau of Standards (TBS), Mauritius Standards Bureau (MSB) and Seychelles Bureau of Standards (SBS) between March 2008 and October 2010. The temperature range of the inter comparison is -50 °C to 450 °C. The results of this comparison are reported here, along with descriptions of the Artefacts and devices used during measurement. This report also presents the uncertainty budget. The results are analysed and normalized error (En) values are reported. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Entanglement with negative Wigner function of three thousand atoms heralded by one photon

NASA Astrophysics Data System (ADS)

McConnell, Robert; Zhang, Hao; Hu, Jiazhong; Ćuk, Senka; Vuletić, Vladan

2016-06-01

Quantum-mechanically correlated (entangled) states of many particles are of interest in quantum information, quantum computing and quantum metrology. Metrologically useful entangled states of large atomic ensembles have been experimentally realized [1, 2, 3, 4, 5, 6, 7, 8, 9, 10], but these states display Gaussian spin distribution functions with a non-negative Wigner function. Non-Gaussian entangled states have been produced in small ensembles of ions [11, 12], and very recently in large atomic ensembles [13, 14, 15]. Here, we generate entanglement in a large atomic ensemble via the interaction with a very weak laser pulse; remarkably, the detection of a single photon prepares several thousand atoms in an entangled state. We reconstruct a negative-valued Wigner function, an important hallmark of nonclassicality, and verify an entanglement depth (minimum number of mutually entangled atoms) of 2910 ± 190 out of 3100 atoms. Attaining such a negative Wigner function and the mutual entanglement of virtually all atoms is unprecedented for an ensemble containing more than a few particles. While the achieved purity of the state is slightly below the threshold for entanglement-induced metrological gain, further technical improvement should allow the generation of states that surpass this threshold, and of more complex Schrödinger cat states for quantum metrology and information processing.

The remarkable metrological history of 14C dating: From ancient Egyptian artifacts to particles of soot and grains of pollen

NASA Astrophysics Data System (ADS)

Currie, L. A.

2003-01-01

Radiocarbon dating would not have been possible if 14C had not had the “wrong” half-life—a fact that delayed its discovery [1]. Following the discovery of this 5730 year radionuclide in laboratory experiments by Ruben and Kamen, it became clear to W. F. Libby that 14C should exist in nature, and that it could serve as a quantitative means for dating artifacts and events marking the history of civilization. The search for natural radiocarbon was a metrological challenge; the level in the living biosphere [ca. 230 Bq/kg] lay far beyond the then current state of the measurement art. This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought 14C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for “molecular dating” at the 10 μg to 100 μg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the “bomb effect,” that spawned new multidisciplinary areas of application, ranging from cosmic ray physics to oceanography to the reconstruction of environmental history.

Development of metrology for freeform optics in reflection mode

NASA Astrophysics Data System (ADS)

Burada, Dali R.; Pant, Kamal K.; Mishra, Vinod; Bichra, Mohamed; Khan, Gufran S.; Sinzinger, Stefan; Shakher, Chandra

2017-06-01

The increased range of manufacturable freeform surfaces offered by the new fabrication techniques is giving opportunities to incorporate them in the optical systems. However, the success of these fabrication techniques depends on the capabilities of metrology procedures and a feedback mechanism to CNC machines for optimizing the manufacturing process. Therefore, a precise and in-situ metrology technique for freeform optics is in demand. Though all the techniques available for aspheres have been extended for the freeform surfaces by the researchers, but none of the techniques has yet been incorporated into the manufacturing machine for in-situ measurement. The most obvious reason is the complexity involved in the optical setups to be integrated in the manufacturing platforms. The Shack-Hartmann sensor offers the potential to be incorporated into the machine environment due to its vibration insensitivity, compactness and 3D shape measurement capability from slope data. In the present work, a measurement scheme is reported in which a scanning Shack-Hartmann Sensor has been employed and used as a metrology tool for measurement of freeform surface in reflection mode. Simulation studies are conducted for analyzing the stitching accuracy in presence of various misalignment errors. The proposed scheme is experimentally verified on a freeform surface of cubic phase profile.

XPS-XRF hybrid metrology enabling FDSOI process

NASA Astrophysics Data System (ADS)

Hossain, Mainul; Subramanian, Ganesh; Triyoso, Dina; Wahl, Jeremy; Mcardle, Timothy; Vaid, Alok; Bello, A. F.; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Pois, Heath; Wang, Ying; Larson, Tom

2016-03-01

Planar fully-depleted silicon-on-insulator (FDSOI) technology potentially offers comparable transistor performance as FinFETs. pFET FDOSI devices are based on a silicon germanium (cSiGe) layer on top of a buried oxide (BOX). Ndoped interfacial layer (IL), high-k (HfO2) layer and the metal gate stacks are then successively built on top of the SiGe layer. In-line metrology is critical in precisely monitoring the thickness and composition of the gate stack and associated underlying layers in order to achieve desired process control. However, any single in-line metrology technique is insufficient to obtain the thickness of IL, high-k, cSiGe layers in addition to Ge% and N-dose in one single measurement. A hybrid approach is therefore needed that combines the capabilities of more than one measurement technique to extract multiple parameters in a given film stack. This paper will discuss the approaches, challenges, and results associated with the first-in-industry implementation of XPS-XRF hybrid metrology for simultaneous detection of high-k thickness, IL thickness, N-dose, cSiGe thickness and %Ge, all in one signal measurement on a FDSOI substrate in a manufacturing fab. Strong correlation to electrical data for one or more of these measured parameters will also be presented, establishing the reliability of this technique.

Measuring soot particles from automotive exhaust emissions

NASA Astrophysics Data System (ADS)

Andres, Hanspeter; Lüönd, Felix; Schlatter, Jürg; Auderset, Kevin; Jordan-Gerkens, Anke; Nowak, Andreas; Ebert, Volker; Buhr, Egbert; Klein, Tobias; Tuch, Thomas; Wiedensohler, Alfred; Mamakos, Athanasios; Riccobono, Francesco; Discher, Kai; Högström, Richard; Yli-Ojanperä, Jaakko; Quincey, Paul

2014-08-01

The European Metrology Research Programme participating countries and the European Union jointly fund a three year project to address the need of the automotive industry for a metrological sound base for exhaust measurements. The collaborative work on particle emissions involves five European National Metrology Institutes, the Tampere University of Technology, the Joint Research Centre for Energy and Transport and the Leibniz Institute for Tropospheric Research. On one hand, a particle number and size standard for soot particles is aimed for. Eventually this will allow the partners to provide accurate and comparable calibrations of measurement instruments for the type approval of Euro 5b and Euro 6 vehicles. Calibration aerosols of combustion particles, silver and graphite proof partially suitable. Yet, a consensus choice together with instrument manufactures is pending as the aerosol choice considerably affects the number concentration measurement. Furthermore, the consortium issued consistent requirements for novel measuring instruments foreseen to replace today's opacimeters in regulatory periodic emission controls of soot and compared them with European legislative requirements. Four partners are conducting a metrological validation of prototype measurement instruments. The novel instruments base on light scattering, electrical, ionisation chamber and diffusion charging sensors and will be tested at low and high particle concentrations. Results shall allow manufacturers to further improve their instruments to comply with legal requirements.

Improving the accuracy of CT dimensional metrology by a novel beam hardening correction method

NASA Astrophysics Data System (ADS)

Zhang, Xiang; Li, Lei; Zhang, Feng; Xi, Xiaoqi; Deng, Lin; Yan, Bin

2015-01-01

Its powerful nondestructive characteristics are attracting more and more research into the study of computed tomography (CT) for dimensional metrology, which offers a practical alternative to the common measurement methods. However, the inaccuracy and uncertainty severely limit the further utilization of CT for dimensional metrology due to many factors, among which the beam hardening (BH) effect plays a vital role. This paper mainly focuses on eliminating the influence of the BH effect in the accuracy of CT dimensional metrology. To correct the BH effect, a novel exponential correction model is proposed. The parameters of the model are determined by minimizing the gray entropy of the reconstructed volume. In order to maintain the consistency and contrast of the corrected volume, a punishment term is added to the cost function, enabling more accurate measurement results to be obtained by the simple global threshold method. The proposed method is efficient, and especially suited to the case where there is a large difference in gray value between material and background. Different spheres with known diameters are used to verify the accuracy of dimensional measurement. Both simulation and real experimental results demonstrate the improvement in measurement precision. Moreover, a more complex workpiece is also tested to show that the proposed method is of general feasibility.

What metrology can do to improve the quality of your atmospheric ammonia measurements

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

2017-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements, namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures, as well as in the infrastructure to attain metrological traceability, i.e. that the results of measurements are traceable to SI-units through an unbroken chain of calibrations. In the framework of the European Metrology Research Programme (EMRP) project on the topic "Metrology for Ammonia in Ambient Air" (MetNH3), European national metrology institutes (NMI's) have joined to tackle the issue of generating SI-traceable reference material, i.e. generate reference gas mixtures containing known amount fractions of NH3.This requires special infrastructure and analytical techniques: Measurements of ambient ammonia are commonly carried out with diffusive samplers or by active sampling with denuders, but such techniques have not yet been extensively validated. Improvements in the metrological traceability may be achieved through the determination of NH3 diffusive sampling rates using ammonia Primary Standard Gas Mixtures (PSMs), developed by gravimetry at the National Physical Laboratory NPL and a controlled atmosphere test facility in combination with on-line monitoring with a cavity ring-down spectrometer. The Federal Institute of Metrology METAS has developed an infrastructure to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol (atmospheric concentrations) and with uncertainties UNH3 <3%. The infrastructure consists of a stationary as well as a mobile device for full flexibility for calibrations in the laboratory and in the field. Both devices apply the method of temperature and pressure dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

European PTTI report

NASA Technical Reports Server (NTRS)

Cordara, Franco; Grimaldi, Sabrina; Leschiutta, Sigfrido

1994-01-01

Time and frequency metrology in Europe presents some peculiar features in its three main components: research on clocks, comparisons and dissemination methods, and dissemination services. Apart from the usual activities of the national metrological laboratories, an increasing number of cooperation between the European countries are promoted inside some European organizations, such as the ECC, EFTA, EUROMET, and WECC. Cooperation between these organizations is covered. The present, evolving situation will be further influenced by the recent political changes in Eastern Europe.

Overlay improvement methods with diffraction based overlay and integrated metrology

NASA Astrophysics Data System (ADS)

Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan

2015-03-01

To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

Green analytical chemistry introduction to chloropropanols determination at no economic and analytical performance costs?

PubMed

Jędrkiewicz, Renata; Orłowski, Aleksander; Namieśnik, Jacek; Tobiszewski, Marek

2016-01-15

In this study we perform ranking of analytical procedures for 3-monochloropropane-1,2-diol determination in soy sauces by PROMETHEE method. Multicriteria decision analysis was performed for three different scenarios - metrological, economic and environmental, by application of different weights to decision making criteria. All three scenarios indicate capillary electrophoresis-based procedure as the most preferable. Apart from that the details of ranking results differ for these three scenarios. The second run of rankings was done for scenarios that include metrological, economic and environmental criteria only, neglecting others. These results show that green analytical chemistry-based selection correlates with economic, while there is no correlation with metrological ones. This is an implication that green analytical chemistry can be brought into laboratories without analytical performance costs and it is even supported by economic reasons. Copyright © 2015 Elsevier B.V. All rights reserved.

Quantum metrology and estimation of Unruh effect

PubMed Central

Wang, Jieci; Tian, Zehua; Jing, Jiliang; Fan, Heng

2014-01-01

We study the quantum metrology for a pair of entangled Unruh-Dewitt detectors when one of them is accelerated and coupled to a massless scalar field. Comparing with previous schemes, our model requires only local interaction and avoids the use of cavities in the probe state preparation process. We show that the probe state preparation and the interaction between the accelerated detector and the external field have significant effects on the value of quantum Fisher information, correspondingly pose variable ultimate limit of precision in the estimation of Unruh effect. We find that the precision of the estimation can be improved by a larger effective coupling strength and a longer interaction time. Alternatively, the energy gap of the detector has a range that can provide us a better precision. Thus we may adjust those parameters and attain a higher precision in the estimation. We also find that an extremely high acceleration is not required in the quantum metrology process. PMID:25424772

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alcock, Simon G., E-mail: simon.alcock@diamond.ac.uk; Nistea, Ioana; Sawhney, Kawal

2016-05-15

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds intomore » the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.« less

Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression.

PubMed

Henn, Mark-Alexander; Silver, Richard M; Villarrubia, John S; Zhang, Nien Fan; Zhou, Hui; Barnes, Bryan M; Ming, Bin; Vladár, András E

2015-01-01

Hybrid metrology, e.g., the combination of several measurement techniques to determine critical dimensions, is an increasingly important approach to meet the needs of the semiconductor industry. A proper use of hybrid metrology may yield not only more reliable estimates for the quantitative characterization of 3-D structures but also a more realistic estimation of the corresponding uncertainties. Recent developments at the National Institute of Standards and Technology (NIST) feature the combination of optical critical dimension (OCD) measurements and scanning electron microscope (SEM) results. The hybrid methodology offers the potential to make measurements of essential 3-D attributes that may not be otherwise feasible. However, combining techniques gives rise to essential challenges in error analysis and comparing results from different instrument models, especially the effect of systematic and highly correlated errors in the measurement on the χ 2 function that is minimized. Both hypothetical examples and measurement data are used to illustrate solutions to these challenges.

Half a century of light scatter metrology and counting

NASA Astrophysics Data System (ADS)

Stover, John C.

2014-09-01

Back in the early days Bill Wolf once said something like: "The guy with the lowest scatter measurement is closest to the right answer." He was often right then - but not anymore. Everything has changed. Today measurements are limited by Rayleigh scatter from the air - not the instrument. We have both written and physical standards and everybody spells BRDF the same way. In the time it takes to give this talk, over 100,000 silicon wafers will be inspected around the world using a few thousand scatterometers - average price about one million dollars each. The way the world illuminates everything from homes to football fields is changing with the advent of high brightness LED's and these lighting systems are designed using a combination of scatter metrology and analysis techniques - many of which were started at The Optical Sciences Center. This paper reviews two major highlights in half a century of scatter metrology progress.

Nonlinear Quantum Metrology of Many-Body Open Systems

NASA Astrophysics Data System (ADS)

Beau, M.; del Campo, A.

2017-07-01

We introduce general bounds for the parameter estimation error in nonlinear quantum metrology of many-body open systems in the Markovian limit. Given a k -body Hamiltonian and p -body Lindblad operators, the estimation error of a Hamiltonian parameter using a Greenberger-Horne-Zeilinger state as a probe is shown to scale as N-[k -(p /2 )], surpassing the shot-noise limit for 2 k >p +1 . Metrology equivalence between initial product states and maximally entangled states is established for p ≥1 . We further show that one can estimate the system-environment coupling parameter with precision N-(p /2 ), while many-body decoherence enhances the precision to N-k in the noise-amplitude estimation of a fluctuating k -body Hamiltonian. For the long-range Ising model, we show that the precision of this parameter beats the shot-noise limit when the range of interactions is below a threshold value.

Development of the metrology and imaging of cellulose nanocrystals

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladár, András; Dagata, John; Farkas, Natalia; Ming, Bin; Wagner, Ryan; Raman, Arvind; Moon, Robert J.; Sabo, Ronald; Wegner, Theodore H.; Beecher, James

2011-02-01

The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNCs) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science. Even the largest trees owe their strength to this newly appreciated class of nanomaterials. Cellulose is the world's most abundant natural, renewable, biodegradable polymer. Cellulose occurs as whisker-like microfibrils that are biosynthesized and deposited in plant material in a continuous fashion. The nanocrystals are isolated by hydrolyzing away the amorphous segments leaving the acid resistant crystalline fragments. Therefore, the basic raw material for new nanomaterial products already abounds in nature and is available to be utilized in an array of future materials. However, commercialization requires the development of efficient manufacturing processes and nanometrology to monitor quality. This paper discusses some of the instrumentation, metrology and standards issues associated with the ramping up for production and use of CNCs.

Measuring the efficiency of control rods in the RBMK critical assembly using a model of RKI-1 reactimeter

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhitarev, V. E., E-mail: vejitarev@yandex.ru; Lebedev, G. V.; Sergevnin, A. Yu.

2016-12-15

The efficiency of control rods of the RBMK critical assembly is measured in a series of experiments. The aim of measurements is to determine the characteristics of the model of an RKI-1 reactimeter. The RKI-1 reactimeter is intended for measuring the efficiency of control rods when, according to conditions of operation, the metrological certification of results of an experiment is required. Complications with the metrological certification of reactimeters arise owing to the fact that usually calculated corrections to the results of measurements are required. When the RKI-1 reactimeter is used, there is no need to introduce calculated corrections; the resultmore » of measurements is given with the indication of substantiated errors. In connection with this, the metrological certification of the results of measurements using the RKI-1 reactimeter is simplified.« less

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

NASA Astrophysics Data System (ADS)

Yacoot, Andrew; Kuetgens, Ulrich

2012-07-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes.

Measuring optical phase digitally in coherent metrology systems

NASA Astrophysics Data System (ADS)

Kelly, Damien P.; Ryle, James; Zhao, Liang; Sheridan, John T.

2017-05-01

The accurate measurement of optical phase has many applications in metrology. For biological samples, which appear transparent, the phase data provides information about the refractive index of the sample. In speckle metrology, the phase can be used to estimate stress and strains of a rough surface with high sensitivity. In this theoretical manuscript we compare and contrast the properties of two techniques for estimating the phase distribution of a wave field under the paraxial approximation: (I) A digital holographic system, and (II) An idealized phase retrieval system. Both systems use a CCD or CMOS array to measure the intensities of the wave fields that are reflected from or transmitted through the sample of interest. This introduces a numerical aspect to the problem. For the two systems above we examine how numerical calculations can limit the performance of these systems leading to a near-infinite number of possible solutions.

High-intensity therapeutic ultrasound: metrological requirements versus clinical usage

NASA Astrophysics Data System (ADS)

Aubry, J.-F.

2012-10-01

High-intensity therapeutic ultrasound (HITU) is an appealing non-invasive, non-ionizing therapeutic modality with a wide range of tissue interactions ranging from transient permeabilization of cell membranes to thermal ablation. The ability to guide and monitor the treatment with an associated ultrasonic or magnetic resonance imaging device has resulted in a dramatic rise in the clinical use of therapeutic ultrasound in the past two decades. Nevertheless, the range of clinical applications and the number of patients treated has grown at a much higher pace than the definition of standards. In this paper the metrological requirements of the therapeutic beams are reviewed and are compared with the current clinical use of image-guided HITU mostly based on a practical approach. Liver therapy, a particularly challenging clinical application, is discussed to highlight the differences between some complex clinical situations and the experimental conditions of the metrological characterization of ultrasonic transducers.

FOREWORD: Special issue on radionuclide metrology

NASA Astrophysics Data System (ADS)

Simpson, Bruce; Judge, Steven

2007-08-01

This special issue of Metrologia on radionuclide metrology is the first of a trilogy on the subject of ionizing radiation measurement, a field that is overseen by Sections I, II and III of the CIPM's Consultative Committee for Ionizing Radiation (CCRI). The idea was first proposed at the 2003 series of CCRI Section meetings, with the general aim of showcasing the relevance and importance of metrology in ionizing radiation to a broader metrological audience. After the 2005 meeting of Section II (measurement of radionuclides), the radioactivity aspect of the project began to move forward in earnest. A working group was set up with the brief that the special issue should be of use by experienced metrologists as an overview of the 'state of the art' to compare progress and scientific content with those in other fields of metrology, as a resource for new metrologists joining the field and as a guide for users of radioactivity to explain how traceability to the international measurement system may be achieved. Since mankind first became aware of the existence of radioactivity just over a century ago (due to its discovery by Becquerel and further work by the Curies), much has been learnt and understood in the interim period. The field of radionuclide metrology that developed subsequently is broad-based and encompasses, amongst others, nuclear physics (experimental and theory), chemistry, mathematics, mathematical statistics, uncertainty analysis and advanced computing for data analysis, simulation and modelling. To determine the activity of radionuclides accurately requires elements of all of these subjects. In more recent decades the focus has been on the practical applications of radioactivity in industry and the health field in particular. In addition, low-level environmental radioactivity monitoring has taken on ever greater importance in the nuclear power era. These developments have required new detection instrumentation and techniques on an ongoing basis to ensure the improvement in accuracy and precision of measurement as demanded by the stringent requirements of the user community, such as the correct calibration of nuclear instrumentation. This leads into the need for traceability to national measurement standards maintained by the national metrology institutes. As part of the radioactivity traceability chain, as for all areas of metrology, it is vital that systems are in place to ensure that national standards can be checked for worldwide uniformity and measurement equivalence. Many of the resulting areas are covered by the topics in this special issue, although specifically excluded from the scope of the publication are topics that are widely covered in other publications due to their application in applied metrology—for example, radiochemistry, environmental gamma spectrometry and alpha spectrometry. There are three sections to this issue, starting with papers on how the CIPM Mutual Recognition Arrangement has been implemented for radionuclide metrology, following into the bulk of the publication with articles on the `state of the art' in radionuclide metrology and ending with traceability to national/international standards in nuclear medicine, environmental monitoring, radiation protection and decommissioning. This special issue in essence follows on from earlier BIPM Monographies that were published in order to provide the base information for radionuclide metrology. In many respects they complement the special issue since much of their content is still valid today, particularly those published more recently as an aid to ensuring consistency of method and data. The BIPM Monographies are freely available to download from the BIPM website at http://www.bipm.org/en/publications/monographies-ri.html. The papers in the special issue draw on the experience of radionuclide metrologists who have been involved in their area of expertise for many years. The authors give readers an insightful account of the selected topics through in-depth review articles. We are indeed indebted to them for accepting this difficult and time-consuming task and also thank the many researchers recognized in the articles who have contributed to expanding the field over many years. The considerable effort put into this issue would not have been possible without input from the appointed referees, as well as the project team also comprising Yoshio Hino, Jose-Marie Los Arcos, Mike Unterweger and Brian Zimmerman. Thanks are also due to the Metrologia Editor, Jeffrey Williams, and the editorial staff for their sterling efforts in keeping the issue on track and the publication on schedule. Last, but not least, we thank Prof. Georgio Moscati, President of the CCRI, and Dr Penny Allisy-Roberts, Executive Secretary of the CCRI, for their continuous interest and support for the project.

Improving Control of Two Motor Controllers

NASA Technical Reports Server (NTRS)

Toland, Ronald W.

2004-01-01

A computer program controls motors that drive translation stages in a metrology system that consists of a pair of two-axis cathetometers. This program is specific to Compumotor Gemini (or equivalent) motors and the Compumotor 6K-series (or equivalent) motor controller. Relative to the software supplied with the controller, this program affords more capabilities and is easier to use. Written as a Virtual Instrument in the LabVIEW software system, the program presents an imitation control panel that the user can manipulate by use of a keyboard and mouse. There are three modes of operation: command, movement, and joystick. In command mode, single commands are sent to the controller for troubleshooting. In movement mode, distance, speed, and/or acceleration commands are sent to the controller. Position readouts from the motors and from position encoders on the translation stages are displayed in marked fields. At any time, the position readouts can be recorded in a file named by the user. In joystick mode, the program yields control of the motors to a joystick. The program sends commands to, and receives data from, the controller via a serial cable connection, using the serial-communication portion of the software supplied with the controller.

German national femtosecond technology project (FST)

NASA Astrophysics Data System (ADS)

Dausinger, Friedrich

2002-06-01

The German federal government started the funding of a national project intended to exploit the potential of femtosecond technology. In a forgoing competition five research consortia had been successful and have started now together with an adjoin research consortium their investigations in the following fields: (i) micro-machining of technical materials for microstructuring and drilling, (ii) medical therapy in: ophthalmology, dentistry, neurology and ear surgery, (iii) metrology, (iv) laser safety, (v) x- ray generation. Lasers, systems and technologies required in these potential fields of applications will be investigated. The program aims at industrial success and is dominated by industrial partners, therefore. The more fundamental research is done in university institutes and research centers.

Scientific Infrastructure to Support Atmospheric Science and Aerosol Science for the Department of Energy's Atmospheric Radiation Measurement Programs at Barrow, Alaska.

NASA Astrophysics Data System (ADS)

Lucero, D. A.; Ivey, M.; Helsel, F.; Hardesty, J.; Dexheimer, D.

2015-12-01

Scientific infrastructure to support atmospheric science and aerosol science for the Department of Energy's Atmospheric Radiation Measurement programs at Barrow, Alaska.The Atmospheric Radiation Measurement (ARM) Program's located at Barrow, Alaska is a U.S. Department of Energy (DOE) site. The site provides a scientific infrastructure and data archives for the international Arctic research community. The infrastructure at Barrow has been in place since 1998, with many improvements since then. Barrow instruments include: scanning precipitation Radar-cloud radar, Doppler Lidar, Eddy correlation flux systems, Ceilometer, Manual and state-of-art automatic Balloon sounding systems, Atmospheric Emitted Radiance Interferometer (AERI), Micro-pulse Lidar (MPL), Millimeter cloud radar, High Spectral Resolution Lidar (HSRL) along with all the standard metrological measurements. Data from these instruments is placed in the ARM data archives and are available to the international research community. This poster will discuss what instruments are at Barrow and the challenges of maintaining these instruments in an Arctic site.

Performances of OsO(4) stabilized CO(2) lasers as optical frequency standards near 29 THz.

PubMed

Daussy, C; Ducos, F; Rovera, G D; Acef, O

2000-01-01

In this paper, we report on the metrological capabilities of CO (2)/OsO(4) optical frequency standards operating around 29 THz. Those frequency standards are currently involved in various fields, such as frequency metrology, high resolution spectroscopy, and Rydberg constant measurements. The most impressive features of the standards lies in the 10(-15) level frequency stability allied to a long-term reproducibility (1 yr) of 1.3x10 (-13).

Laboratories new to the ICRM.

PubMed

Karam, Lisa; Anagnostakis, Marios J; Gudelis, Arunas; Marsoem, Pujadi; Mauring, Alexander; Wurdiyanto, Gatot; Yücel, Ülkü

2012-09-01

The Scientific Committee of the ICRM decided, for the 2011 Conference, to present laboratories that are at a key developmental stage in establishing, expanding or applying radionuclide metrology capabilities. The expansion of radionuclide metrology capabilities is crucial to meet evolving and emerging needs in health care, environmental monitoring, and nuclear energy. Five laboratories (from Greece, Lithuania, Indonesia, Norway and Turkey) agreed to participate. Each laboratory is briefly introduced, and examples of their capabilities and standardization activities are discussed. Published by Elsevier Ltd.

Aerospace Mechanisms Symposium (22nd) Held at Hampton, Virginia on 4-6 May 1988.

DTIC Science & Technology

1988-05-06

monitoring is accomplished by a pressure transducer located near the hole drilled through the vessel wall between seals. A lip is machined on the...are presented and a design example involving a machine tool metrology bench is given. Design goals included thousandfold strain attenuation in the...systems such as a metrology bench, etc. These bodies must be supported. Six degrees of freedom must be fixed, but if the base upon which they are

Surface Displacement Measurements, Strain and Vibrational Analysis using Speckle Metrology Techniques.

DTIC Science & Technology

1980-03-01

Ennos, A. E., " Measurement by Laser Photography," National Physical Laboratory, Division of Optical Metrology, Teddington, Middlesex, U.K. 9. Archbold...Field Measurement ," Optics and Laser TechnoloZ, pp. 216 - 219, October 1776. 149 37. Khetan, R. P., and Chiang, F. P., "Strain Analysis by One Beam...AD-AO85 145 NAVAL POSTGRADUATE SCHOOL MONTEREY CA F/G 17/8 SURFACE DISPLACEMENT MEASUREMENTS , STRAIN AND VIBRATIONAL ANALY-ETC(U) MAR GO A B

Recent developments in dimensional nanometrology using AFMs

NASA Astrophysics Data System (ADS)

Yacoot, Andrew; Koenders, Ludger

2011-12-01

Scanning probe microscopes, in particular the atomic force microscope (AFM), have developed into sophisticated instruments that, throughout the world, are no longer used just for imaging, but for quantitative measurements. A role of the national measurement institutes has been to provide traceable metrology for these instruments. This paper presents a brief overview as to how this has been achieved, highlights the future requirements for metrology to support developments in AFM technology and describes work in progress to meet this need.

Addressing FinFET metrology challenges in 1X node using tilt-beam CD-SEM

NASA Astrophysics Data System (ADS)

Zhang, Xiaoxiao; Zhou, Hua; Ge, Zhenhua; Vaid, Alok; Konduparthi, Deepasree; Osorio, Carmen; Ventola, Stefano; Meir, Roi; Shoval, Ori; Kris, Roman; Adan, Ofer; Bar-Zvi, Maayan

2014-04-01

At 1X node, 3D FinFETS raise a number of new metrology challenges. Gate height and fin height are two of the most important parameters for process control. At present there is a metrology gap in inline in-die measurement of these parameters. In order to fill this metrology gap, in-column beam tilt has been developed and implemented on Applied Materials V4i+ top-down CD-SEM for height measurement. A low tilt (5°) beam and a high tilt (14°) beam have been calibrated to obtain two sets of images providing measurement of sidewall edge width to calculate height in the host. Evaluations are done with applications in both gate height and fin height. TEM correlation with R2 being 0.89 and precision of 0.81nm have been achieved on various in-die features in gate height application. Fin height measurement shows less accuracy (R2 being 0.77) and precision (1.49 nm) due to challenges brought by fin geometry, yet still promising as first attempt. Sensitivity to DOE offset, die-to-die and in-die variation is demonstrated in both gate height and fin height. Process defect is successfully captured from inline wafers with gate height measurement implemented in production. This is the first successful demonstration of inline in-die gate height measurement for 14nm FinFET process control.

Automatic pattern localization across layout database and photolithography mask

NASA Astrophysics Data System (ADS)

Morey, Philippe; Brault, Frederic; Beisser, Eric; Ache, Oliver; Röth, Klaus-Dieter

2016-03-01

Advanced process photolithography masks require more and more controls for registration versus design and critical dimension uniformity (CDU). The distribution of the measurement points should be distributed all over the whole mask and may be denser in areas critical to wafer overlay requirements. This means that some, if not many, of theses controls should be made inside the customer die and may use non-dedicated patterns. It is then mandatory to access the original layout database to select patterns for the metrology process. Finding hundreds of relevant patterns in a database containing billions of polygons may be possible, but in addition, it is mandatory to create the complete metrology job fast and reliable. Combining, on one hand, a software expertise in mask databases processing and, on the other hand, advanced skills in control and registration equipment, we have developed a Mask Dataprep Station able to select an appropriate number of measurement targets and their positions in a huge database and automatically create measurement jobs on the corresponding area on the mask for the registration metrology system. In addition, the required design clips are generated from the database in order to perform the rendering procedure on the metrology system. This new methodology has been validated on real production line for the most advanced process. This paper presents the main challenges that we have faced, as well as some results on the global performances.

Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH

PubMed Central

Dziarzhytski, Siarhei; Siewert, Frank; Gwalt, Grzegorz; Seliger, Tino; Rübhausen, Michael; Weigelt, Holger; Brenner, Günter

2018-01-01

The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of about 2 to 20 meV (design values) featuring an efficient elastic line suppression as well as effective stray light rejection. Such a design enables studies of low-energy excitations like, for example, phonons in solids close to the vicinity of the elastic line. The Raman spectrometer effectively operates with four reflective off-axial parabolic mirrors and two plane-grating units. The optics quality and their precise alignment are crucial to guarantee best performance of the instrument. Here, results on a comprehensive investigation of the quality of the spectrometer diffraction gratings are presented. The gratings have been characterized by ex situ metrology at the BESSY-II Optics Laboratory, employing slope measuring deflectometry and interferometry as well as atomic force microscopy studies. The efficiency of these key optical elements has been measured at the at-wavelength metrology laboratory using the reflectometer at the BESSY-II Optics beamline. Also, the metrology results are discussed with respect to the expected resolving power of the instrument by including them in ray-tracing studies of the instrument. PMID:29271763

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

NASA Astrophysics Data System (ADS)

Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brueck, Hans-Juergen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Volodymyr; Jonckheere, Rik M.; Philipsen, Vicky; Schaetz, Thomas; Sommer, Karl

2002-08-01

Critical Dimension fidelity continues to be one of the key driving parameters defining photomask quality and printing performance. The present advanced optical CD metrology systems, operating at i-line, will very soon be challenged as viable tools owing to their restricted resolution and measurement linearity impact on the ability to produce repeatable measurements. Alternative measurement technologies such as CD-SEM and -AFM have started to appear, but are also not without tier concerns in the field of reticle CD metrology. This paper introduces a new optical metrology system (MueTec /) operating at DUV wavelength (248nm), which has been specifically designed to meet the resolution and measurement repeatability requirements of reticle manufacture at the 130nm and 100nm nodes. The system is based upon a specially designed mechanical-optical platform for maximum stability and very advanced optical, illumination, alignment and software systems. The at wavelength operation of this system also makes it an ideal platform for defect printability analysis and review. The system is currently part of a European Commission funded assessment project (IST-2000-28086: McD'OR) to develop a testing strategy to verify the system performance, agree on equipment specifications and demonstrate its capability on advanced production reticles - including long-term reliability. It is the preliminary results from this evaluation that are presented here.

Enabling Quantitative Optical Imaging for In-die-capable Critical Dimension Targets

PubMed Central

Barnes, B.M.; Henn, M.-A.; Sohn, M. Y.; Zhou, H.; Silver, R. M.

2017-01-01

Dimensional scaling trends will eventually bring semiconductor critical dimensions (CDs) down to only a few atoms in width. New optical techniques are required to address the measurement and variability for these CDs using sufficiently small in-die metrology targets. Recently, Qin et al. [Light Sci Appl, 5, e16038 (2016)] demonstrated quantitative model-based measurements of finite sets of lines with features as small as 16 nm using 450 nm wavelength light. This paper uses simulation studies, augmented with experiments at 193 nm wavelength, to adapt and optimize the finite sets of features that work as in-die-capable metrology targets with minimal increases in parametric uncertainty. A finite element based solver for time-harmonic Maxwell's equations yields two- and three-dimensional simulations of the electromagnetic scattering for optimizing the design of such targets as functions of reduced line lengths, fewer number of lines, fewer focal positions, smaller critical dimensions, and shorter illumination wavelength. Metrology targets that exceeded performance requirements are as short as 3 μm for 193 nm light, feature as few as eight lines, and are extensible to sub-10 nm CDs. Target areas measured at 193 nm can be fifteen times smaller in area than current state-of-the-art scatterometry targets described in the literature. This new methodology is demonstrated to be a promising alternative for optical model-based in-die CD metrology. PMID:28757674

Large optics for the National Ignition Facility

DOE Office of Scientific and Technical Information (OSTI.GOV)

Baisden, P.

2015-01-12

The National Ignition Facility (NIF) laser with its 192 independent laser beams is not only the world’s largest laser, it is also the largest optical system ever built. With its 192 independent laser beams, the NIF requires a total of 7648 large-aperture (meter-sized) optics. One of the many challenges in designing and building NIF has been to carry out the research and development on optical materials, optics design, and optics manufacturing and metrology technologies needed to achieve NIF’s high output energies and precision beam quality. This paper describes the multiyear, multi-supplier, development effort that was undertaken to develop the advancedmore » optical materials, coatings, fabrication technologies, and associated process improvements necessary to manufacture the wide range of NIF optics. The optics include neodymium-doped phosphate glass laser amplifiers; fused silica lenses, windows, and phase plates; mirrors and polarizers with multi-layer, high-reflectivity dielectric coatings deposited on BK7 substrates; and potassium di-hydrogen phosphate crystal optics for fast optical switches, frequency conversion, and polarization rotation. Also included is a discussion of optical specifications and custom metrology and quality-assurance tools designed, built, and fielded at supplier sites to verify compliance with the stringent NIF specifications. In addition, a brief description of the ongoing program to improve the operational lifetime (i.e., damage resistance) of optics exposed to high fluence in the 351-nm (3ω) is provided.« less

High-Speed Digital Interferometry

NASA Technical Reports Server (NTRS)

De Vine, Glenn; Shaddock, Daniel A.; Ware, Brent; Spero, Robert E.; Wuchenich, Danielle M.; Klipstein, William M.; McKenzie, Kirk

2012-01-01

Digitally enhanced heterodyne interferometry (DI) is a laser metrology technique employing pseudo-random noise (PRN) codes phase-modulated onto an optical carrier. Combined with heterodyne interferometry, the PRN code is used to select individual signals, returning the inherent interferometric sensitivity determined by the optical wavelength. The signal isolation arises from the autocorrelation properties of the PRN code, enabling both rejection of spurious signals (e.g., from scattered light) and multiplexing capability using a single metrology system. The minimum separation of optical components is determined by the wavelength of the PRN code.

Comparative advantages and limitations of the basic metrology methods applied to the characterization of nanomaterials.

PubMed

Linkov, Pavel; Artemyev, Mikhail; Efimov, Anton E; Nabiev, Igor

2013-10-07

Fabrication of modern nanomaterials and nanostructures with specific functional properties is both scientifically promising and commercially profitable. The preparation and use of nanomaterials require adequate methods for the control and characterization of their size, shape, chemical composition, crystalline structure, energy levels, pathways and dynamics of physical and chemical processes during their fabrication and further use. In this review, we discuss different instrumental methods for the analysis and metrology of materials and evaluate their advantages and limitations at the nanolevel.

Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

NASA Astrophysics Data System (ADS)

Benschop, Jos; Engelen, Andre; Cramer, Hugo; Kubis, Michael; Hinnen, Paul; van der Laan, Hans; Bhattacharyya, Kaustuve; Mulkens, Jan

2013-04-01

The overlay, CDU and focus requirements for the 20nm node can only be met using a holistic lithography approach whereby full use is made of high-order, field-by-field, scanner correction capabilities. An essential element in this approach is a fast, precise and accurate in-line metrology sensor, capable to measure on product. The capabilities of the metrology sensor as well as the impact on overlay, CD and focus will be shared in this paper.

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

NASA Astrophysics Data System (ADS)

Bhattacharyya, Kaustuve; Ke, Chih-Ming; Huang, Guo-Tsai; Chen, Kai-Hsiung; Smilde, Henk-Jan H.; Fuchs, Andreas; Jak, Martin; van Schijndel, Mark; Bozkurt, Murat; van der Schaar, Maurits; Meyer, Steffen; Un, Miranda; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Liang, Frida; den Boef, Arie; ten Berge, Peter; Kubis, Michael; Wang, Cathy; Fouquet, Christophe; Terng, L. G.; Hwang, David; Cheng, Kevin; Gau, TS; Ku, Y. C.

2013-04-01

Aggressive on-product overlay requirements in advanced nodes are setting a superior challenge for the semiconductor industry. This forces the industry to look beyond the traditional way-of-working and invest in several new technologies. Integrated metrology2, in-chip overlay control, advanced sampling and process correction-mechanism (using the highest order of correction possible with scanner interface today), are a few of such technologies considered in this publication.

[Metrological analysis of measuring systems in testing an anticipatory reaction to the position of a moving object].

PubMed

Aksiuta, E F; Ostashev, A V; Sergeev, E V; Aksiuta, V E

1997-01-01

The methods of the information (entropy) error theory were used to make a metrological analysis of the well-known commercial measuring systems for timing an anticipative reaction (AR) to the position of a moving object, which is based on the electromechanical, gas-discharge, and electron principles. The required accuracy of measurement was ascertained to be achieved only by using the systems based on the electron principle of moving object simulation and AR measurement.

An interferometer for high-resolution optical surveillance from GEO - internal metrology breadboard

NASA Astrophysics Data System (ADS)

Bonino, L.; Bresciani, F.; Piasini, G.; Pisani, M.; Cabral, A.; Rebordão, J.; Musso, F.

2017-11-01

This paper describes the internal metrology breadboard development activities performed in the frame of the EUCLID CEPA 9 RTP 9.9 "High Resolution Optical Satellite Sensor" project of the WEAO Research Cell by AAS-I and INETI. The Michelson Interferometer Testbed demonstrates the possibility of achieving a cophasing condition between two arms of the optical interferometer starting from a large initial white light Optical Path Difference (OPD) unbalance and of maintaining the fringe pattern stabilized in presence of disturbances.

Bibliography of Soviet Laser Developments Number 54, July-August 1981.

DTIC Science & Technology

1982-12-01

441. Kotyuk, A.F., A.P. Romashkov, and N.Sh. Khaykin (0). Production of a metrologic control system for measuring pulse power. IT, no. 8, 1981, 30-31...Possibility of recording the bas!ic characteristics of a wave process by a laser strain gauge . Sb 17, 30-34. 474. Dubovoy, A.P., and V.M. Sinel’nikov (0...Yu.S. Nechayev (560). Metrological features of a laser device with a single-mirror deflecting unit. Institut fiziki vysokoy energiy. Serpukhov

Rules for Optical Testing

NASA Technical Reports Server (NTRS)

Stahl, H. Philip

2014-01-01

Based on 30 years of optical testing experience, a lot of mistakes, a lot of learning and a lot of experience, I have defined seven guiding principles for optical testing - regardless of how small or how large the optical testing or metrology task: Fully Understand the Task, Develop an Error Budget, Continuous Metrology Coverage, Know where you are, Test like you fly, Independent Cross-Checks, Understand All Anomalies. These rules have been applied with great success to the inprocess optical testing and final specification compliance testing of the JWST mirrors.

Microeconomics of 300-mm process module control

NASA Astrophysics Data System (ADS)

Monahan, Kevin M.; Chatterjee, Arun K.; Falessi, Georges; Levy, Ady; Stoller, Meryl D.

2001-08-01

Simple microeconomic models that directly link metrology, yield, and profitability are rare or non-existent. In this work, we validate and apply such a model. Using a small number of input parameters, we explain current yield management practices in 200 mm factories. The model is then used to extrapolate requirements for 300 mm factories, including the impact of simultaneous technology transitions to 130nm lithography and integrated metrology. To support our conclusions, we use examples relevant to factory-wide photo module control.

EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The aimed uncertainty is < 1 % for static mixtures at the 10 to 100 μmol/mol level, and < 3 % for portable dynamic generators in the 0 to 500 nmol/mol amount fraction range. Special emphasis is put on the minimisation of adsorption losses. To develop and characterise laser based optical spectrometric standards Evaluation and characterisation of the applicability of a newly developed open-path as well as of existing extractive measurement techniques as optical transfer standards according to metrological standards. To establish the transfer from high-accuracy standards to field applicable methods Employment of characterised exposure chambers as well as field sites for validation and comparison experiments to test and evaluate the performance of different instruments and measurement methods at ammonia amount fractions of the ambient air. The active exchange in workshops and inter-comparisons, publications in technical journals as well as presentations at relevant conferences and standardisation bodies will transfer the knowledge to stakeholders and end-users. The work has been carried out in the framework of the EMRP. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

APMP.QM-K111—propane in nitrogen

NASA Astrophysics Data System (ADS)

Lin, Tsai-Yin; Liu, Hsin-Wang; Huang, Chiung-Kun; Kang, Namgoo; Bae, Hyun Kil; Woo, Jin Chun; Bi, Zhe; Zhou, Zeyi; Sinweeruthai, Ratirat; Wongjuk, Arnuttachai; Li, Hou; Beng Keat, Teo; Hui, Liu; Wu, Thomas; Hock Ann, Chua; Smeulders, Damian; Briton McCallum, John; Tendai Satumba, Raymond; Shimosaka, Takuya; Matsumoto, Nobuhiro; Kadir, Haslina Abdul; Fauzi Ahmad, Mohamad; Nasir, Noor Hidaya Abdul; Nishino, Tomoe; Akima, Dai; Uehara, Shinji

2018-01-01

This document describes the result of a key comparison for propane in nitrogen. The nominal amount-of-substance fraction of propane is 1000 μmol/mol. The comparison aimed to assess the measurement capability of participants in gas analysis. Nine NMIs or DIs participated in the comparison. CERI participated in a key comparison CCQM-K111—propane in nitrogen, and coordinated this key comparison. Therefore, every participants' results of this comparison are linking to the CCQM-K111. Gravimetric values of the samples were used as key comparison reference values (KCRVs). Measured values of eight participants were within +/- 0.25 % of the KCRVs. Many participants reported purity or impurity analysis of materials. These results are also able to assess the participants' capability of the analysis. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Second metrology round-robin of APS, ESRF and SPring-8 laboratories of elliptical and spherical hard-x-ray mirrors.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rommeveaux, A.; Assoufid, L.; Ohashi, H.

2007-01-01

The first series of metrology round-robin measurements carried out in 2005 at the APS, ESRF and SPring-8 metrology laboratories involving two flat x-ray mirrors and a cylindrical x-ray mirror has shown excellent agreement among the three facilities Long Trace Profilers (LTP) despite their architectural differences. Because of the growing interest in diffraction-limited hard x-ray K-B focusing mirrors, it was decided to extend the round robin measurements to spherical and aspheric x-ray mirrors. The strong surface slope variation of these mirrors presents a real challenge to LTP. As a result, new LTP measurement protocol has to be developed and implemented tomore » ensure measurement accuracy and consistency. In this paper, different measurement techniques and procedures will be described, the results will be discussed, and comparison will be extended to micro-stitching interferometry measurements performed at Osaka University, Japan.« less

Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates.

PubMed

Wasak, Tomasz; Chwedeńczuk, Jan

2018-04-06

We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F=1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure-the local operations, the measurements, and the inequality-necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

Advantages of High Tolerance Measurements in Fusion Environments Applying Photogrammetry

DOE Office of Scientific and Technical Information (OSTI.GOV)

T. Dodson, R. Ellis, C. Priniski, S. Raftopoulos, D. Stevens, M. Viola

2009-02-04

Photogrammetry, a state-of-the-art technique of metrology employing digital photographs as the vehicle for measurement, has been investigated in the fusion environment. Benefits of this high tolerance methodology include relatively easy deployment for multiple point measurements and deformation/distortion studies. Depending on the equipment used, photogrammetric systems can reach tolerances of 25 microns (0.001 in) to 100 microns (0.004 in) on a 3-meter object. During the fabrication and assembly of the National Compact Stellarator Experiment (NCSX) the primary measurement systems deployed were CAD coordinate-based computer metrology equipment and supporting algorithms such as both interferometer-aided (IFM) and absolute distance measurementbased (ADM) laser trackers,more » as well as portable Coordinate Measurement Machine (CMM) arms. Photogrammetry was employed at NCSX as a quick and easy tool to monitor coil distortions incurred during welding operations of the machine assembly process and as a way to reduce assembly downtime for metrology processes.« less

Laser SRS tracker for reverse prototyping tasks

NASA Astrophysics Data System (ADS)

Kolmakov, Egor; Redka, Dmitriy; Grishkanich, Aleksandr; Tsvetkov, Konstantin

2017-10-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Metrological challenges for measurements of key climatological observables, Part 4: Atmospheric relative humidity

PubMed Central

Lovell-Smith, J W; Feistel, R; Harvey, A H; Hellmuth, O; Bell, S A; Heinonen, M; Cooper, J R

2016-01-01

Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth’s radiation balance, atmospheric water vapour is the strongest “greenhouse” gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. In this paper, we examine the climatologically relevant atmospheric relative humidity, noting fundamental deficiencies in the definition of this key observable. The metrological history of this quantity is reviewed, problems with its current definition and measurement practice are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures, (BIPM), in cooperation with the International Association for the Properties of Water and Steam, IAPWS, along with other international organisations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions for this long standing metrological problem, such as are suggested here. PMID:26877551

[Fundamental aspects for accrediting medical equipment calibration laboratories in Colombia].

PubMed

Llamosa-Rincón, Luis E; López-Isaza, Giovanni A; Villarreal-Castro, Milton F

2010-02-01

Analysing the fundamental methodological aspects which should be considered when drawing up calibration procedure for electro-medical equipment, thereby permitting international standard-based accreditation of electro-medical metrology laboratories in Colombia. NTC-ISO-IEC 17025:2005 and GTC-51-based procedures for calibrating electro-medical equipment were implemented and then used as patterns. The mathematical model for determining the estimated uncertainty value when calibrating electro-medical equipment for accreditation by the Electrical Variable Metrology Laboratory's Electro-medical Equipment Calibration Area accredited in compliance with Superintendence of Industry and Commerce Resolution 25771 May 26th 2009 consists of two equations depending on the case; they are: E = (Ai + sigmaAi) - (Ar + sigmaAr + deltaAr1) and E = (Ai + sigmaAi) - (Ar + sigmaA + deltaAr1). The mathematical modelling implemented for measuring uncertainty in the Universidad Tecnológica de Pereira's Electrical Variable Metrology Laboratory (Electro-medical Equipment Calibration Area) will become a good guide for calibration initiated in other laboratories in Colombia and Latin-America.

Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates

NASA Astrophysics Data System (ADS)

Wasak, Tomasz; Chwedeńczuk, Jan

2018-04-01

We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F =1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure—the local operations, the measurements, and the inequality—necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

With Great Measurements Come Great Results

NASA Astrophysics Data System (ADS)

Williams, Carl

Measurements are the foundation for science and modern life. Technologies we take for granted every day depend on them-cell phones, CAT scans, pharmaceuticals, even sports equipment. Metrology, or measurement science, determines what industry can make reliably and what they cannot. At the National Institute of Standards and Technology (NIST) we specialize in making world class measurements that an incredibly wide range of industries use to continually improve their products - computer chips with nanoscale components, atomic clocks that you can hold in your hand, lasers for both super-strong welds and delicate eye surgeries. Think of all the key technologies developed over the last 100 years and better measurements, standards, or analysis techniques played a role in making them possible. NIST works collaboratively with industry researchers on the advanced metrology for tomorrow's technologies. A new kilogram based on electromagnetic force, cars that weigh half as much but are just as strong, quantum computers, personalized medicine, single atom devices - it's all happening in our labs now. This talk will focus on how metrology creates the future.

Lightweight UAV with on-board photogrammetry and single-frequency GPS positioning for metrology applications

NASA Astrophysics Data System (ADS)

Daakir, M.; Pierrot-Deseilligny, M.; Bosser, P.; Pichard, F.; Thom, C.; Rabot, Y.; Martin, O.

2017-05-01

This article presents a coupled system consisting of a single-frequency GPS receiver and a light photogrammetric quality camera embedded in an Unmanned Aerial Vehicle (UAV). The aim is to produce high quality data that can be used in metrology applications. The issue of Integrated Sensor Orientation (ISO) of camera poses using only GPS measurements is presented and discussed. The accuracy reached by our system based on sensors developed at the French Mapping Agency (IGN) Opto-Electronics, Instrumentation and Metrology Laboratory (LOEMI) is qualified. These sensors are specially designed for close-range aerial image acquisition with a UAV. Lever-arm calibration and time synchronization are explained and performed to reach maximum accuracy. All processing steps are detailed from data acquisition to quality control of final products. We show that an accuracy of a few centimeters can be reached with this system which uses low-cost UAV and GPS module coupled with the IGN-LOEMI home-made camera.

Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Advanced Light Source; Yashchuk, Valeriy V; Kirschman, Jonathan L.

2008-07-14

The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performancemore » and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation.« less

Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

NASA Astrophysics Data System (ADS)

Rerucha, Simon; Yacoot, Andrew; Pham, Tuan M.; Cizek, Martin; Hucl, Vaclav; Lazar, Josef; Cip, Ondrej

2017-04-01

We demonstrated that an iodine stabilized distributed Bragg reflector (DBR) diode based laser system lasing at a wavelength in close proximity to λ =633 nm could be used as an alternative laser source to the helium-neon lasers in both scientific and industrial metrology. This yields additional advantages besides the optical frequency stability and coherence: inherent traceability, wider optical frequency tuning range, higher output power and high frequency modulation capability. We experimentally investigated the characteristics of the laser source in two major steps: first using a wavelength meter referenced to a frequency comb controlled with a hydrogen maser and then on an interferometric optical bench testbed where we compared the performance of the laser system with that of a traditional frequency stabilized He-Ne laser. The results indicate that DBR diode laser system provides a good laser source for applications in dimensional (nano)metrology, especially in conjunction with novel interferometric detection methods exploiting high frequency modulation or multiaxis measurement systems.

Unconditional violation of the shot-noise limit in photonic quantum metrology

NASA Astrophysics Data System (ADS)

Slussarenko, Sergei; Weston, Morgan M.; Chrzanowski, Helen M.; Shalm, Lynden K.; Verma, Varun B.; Nam, Sae Woo; Pryde, Geoff J.

2017-11-01

Interferometric phase measurement is widely used to precisely determine quantities such as length, speed and material properties1-3. Without quantum correlations, the best phase sensitivity Δ ϕ achievable using n photons is the shot-noise limit, Δ ϕ =1 /√{n }. Quantum-enhanced metrology promises better sensitivity, but, despite theoretical proposals stretching back decades3,4, no measurement using photonic (that is, definite photon number) quantum states has truly surpassed the shot-noise limit. Instead, all such demonstrations, by discounting photon loss, detector inefficiency or other imperfections, have considered only a subset of the photons used. Here, we use an ultrahigh-efficiency photon source and detectors to perform unconditional entanglement-enhanced photonic interferometry. Sampling a birefringent phase shift, we demonstrate precision beyond the shot-noise limit without artificially correcting our results for loss and imperfections. Our results enable quantum-enhanced phase measurements at low photon flux and open the door to the next generation of optical quantum metrology advances.

Frequency comb transferred by surface plasmon resonance

PubMed Central

Geng, Xiao Tao; Chun, Byung Jae; Seo, Ji Hoon; Seo, Kwanyong; Yoon, Hana; Kim, Dong-Eon; Kim, Young-Jin; Kim, Seungchul

2016-01-01

Frequency combs, millions of narrow-linewidth optical modes referenced to an atomic clock, have shown remarkable potential in time/frequency metrology, atomic/molecular spectroscopy and precision LIDARs. Applications have extended to coherent nonlinear Raman spectroscopy of molecules and quantum metrology for entangled atomic qubits. Frequency combs will create novel possibilities in nano-photonics and plasmonics; however, its interrelation with surface plasmons is unexplored despite the important role that plasmonics plays in nonlinear spectroscopy and quantum optics through the manipulation of light on a subwavelength scale. Here, we demonstrate that a frequency comb can be transformed to a plasmonic comb in plasmonic nanostructures and reverted to the original frequency comb without noticeable degradation of <6.51 × 10−19 in absolute position, 2.92 × 10−19 in stability and 1 Hz in linewidth. The results indicate that the superior performance of a well-defined frequency comb can be applied to nanoplasmonic spectroscopy, quantum metrology and subwavelength photonic circuits. PMID:26898307

Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression

PubMed Central

Henn, Mark-Alexander; Silver, Richard M.; Villarrubia, John S.; Zhang, Nien Fan; Zhou, Hui; Barnes, Bryan M.; Ming, Bin; Vladár, András E.

2015-01-01

Hybrid metrology, e.g., the combination of several measurement techniques to determine critical dimensions, is an increasingly important approach to meet the needs of the semiconductor industry. A proper use of hybrid metrology may yield not only more reliable estimates for the quantitative characterization of 3-D structures but also a more realistic estimation of the corresponding uncertainties. Recent developments at the National Institute of Standards and Technology (NIST) feature the combination of optical critical dimension (OCD) measurements and scanning electron microscope (SEM) results. The hybrid methodology offers the potential to make measurements of essential 3-D attributes that may not be otherwise feasible. However, combining techniques gives rise to essential challenges in error analysis and comparing results from different instrument models, especially the effect of systematic and highly correlated errors in the measurement on the χ2 function that is minimized. Both hypothetical examples and measurement data are used to illustrate solutions to these challenges. PMID:26681991

Neutron activation analysis: A primary method of measurement

NASA Astrophysics Data System (ADS)

Greenberg, Robert R.; Bode, Peter; De Nadai Fernandes, Elisabete A.

2011-03-01

Neutron activation analysis (NAA), based on the comparator method, has the potential to fulfill the requirements of a primary ratio method as defined in 1998 by the Comité Consultatif pour la Quantité de Matière — Métrologie en Chimie (CCQM, Consultative Committee on Amount of Substance — Metrology in Chemistry). This thesis is evidenced in this paper in three chapters by: demonstration that the method is fully physically and chemically understood; that a measurement equation can be written down in which the values of all parameters have dimensions in SI units and thus having the potential for metrological traceability to these units; that all contributions to uncertainty of measurement can be quantitatively evaluated, underpinning the metrological traceability; and that the performance of NAA in CCQM key-comparisons of trace elements in complex matrices between 2000 and 2007 is similar to the performance of Isotope Dilution Mass Spectrometry (IDMS), which had been formerly designated by the CCQM as a primary ratio method.

Mathematical calibration procedure of a capacitive sensor-based indexed metrology platform

NASA Astrophysics Data System (ADS)

Brau-Avila, A.; Santolaria, J.; Acero, R.; Valenzuela-Galvan, M.; Herrera-Jimenez, V. M.; Aguilar, J. J.

2017-03-01

The demand for faster and more reliable measuring tasks for the control and quality assurance of modern production systems has created new challenges for the field of coordinate metrology. Thus, the search for new solutions in coordinate metrology systems and the need for the development of existing ones still persists. One example of such a system is the portable coordinate measuring machine (PCMM), the use of which in industry has considerably increased in recent years, mostly due to its flexibility for accomplishing in-line measuring tasks as well as its reduced cost and operational advantages compared to traditional coordinate measuring machines. Nevertheless, PCMMs have a significant drawback derived from the techniques applied in the verification and optimization procedures of their kinematic parameters. These techniques are based on the capture of data with the measuring instrument from a calibrated gauge object, fixed successively in various positions so that most of the instrument measuring volume is covered, which results in time-consuming, tedious and expensive verification and optimization procedures. In this work the mathematical calibration procedure of a capacitive sensor-based indexed metrology platform (IMP) is presented. This calibration procedure is based on the readings and geometric features of six capacitive sensors and their targets with nanometer resolution. The final goal of the IMP calibration procedure is to optimize the geometric features of the capacitive sensors and their targets in order to use the optimized data in the verification procedures of PCMMs.

Machine learning and predictive data analytics enabling metrology and process control in IC fabrication

NASA Astrophysics Data System (ADS)

Rana, Narender; Zhang, Yunlin; Wall, Donald; Dirahoui, Bachir; Bailey, Todd C.

2015-03-01

Integrate circuit (IC) technology is going through multiple changes in terms of patterning techniques (multiple patterning, EUV and DSA), device architectures (FinFET, nanowire, graphene) and patterning scale (few nanometers). These changes require tight controls on processes and measurements to achieve the required device performance, and challenge the metrology and process control in terms of capability and quality. Multivariate data with complex nonlinear trends and correlations generally cannot be described well by mathematical or parametric models but can be relatively easily learned by computing machines and used to predict or extrapolate. This paper introduces the predictive metrology approach which has been applied to three different applications. Machine learning and predictive analytics have been leveraged to accurately predict dimensions of EUV resist patterns down to 18 nm half pitch leveraging resist shrinkage patterns. These patterns could not be directly and accurately measured due to metrology tool limitations. Machine learning has also been applied to predict the electrical performance early in the process pipeline for deep trench capacitance and metal line resistance. As the wafer goes through various processes its associated cost multiplies. It may take days to weeks to get the electrical performance readout. Predicting the electrical performance early on can be very valuable in enabling timely actionable decision such as rework, scrap, feedforward, feedback predicted information or information derived from prediction to improve or monitor processes. This paper provides a general overview of machine learning and advanced analytics application in the advanced semiconductor development and manufacturing.

Entanglement with negative Wigner function of almost 3,000 atoms heralded by one photon.

PubMed

McConnell, Robert; Zhang, Hao; Hu, Jiazhong; Ćuk, Senka; Vuletić, Vladan

2015-03-26

Quantum-mechanically correlated (entangled) states of many particles are of interest in quantum information, quantum computing and quantum metrology. Metrologically useful entangled states of large atomic ensembles have been experimentally realized, but these states display Gaussian spin distribution functions with a non-negative Wigner quasiprobability distribution function. Non-Gaussian entangled states have been produced in small ensembles of ions, and very recently in large atomic ensembles. Here we generate entanglement in a large atomic ensemble via an interaction with a very weak laser pulse; remarkably, the detection of a single photon prepares several thousand atoms in an entangled state. We reconstruct a negative-valued Wigner function--an important hallmark of non-classicality--and verify an entanglement depth (the minimum number of mutually entangled atoms) of 2,910 ± 190 out of 3,100 atoms. Attaining such a negative Wigner function and the mutual entanglement of virtually all atoms is unprecedented for an ensemble containing more than a few particles. Although the achieved purity of the state is slightly below the threshold for entanglement-induced metrological gain, further technical improvement should allow the generation of states that surpass this threshold, and of more complex Schrödinger cat states for quantum metrology and information processing. More generally, our results demonstrate the power of heralded methods for entanglement generation, and illustrate how the information contained in a single photon can drastically alter the quantum state of a large system.

Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler

NASA Astrophysics Data System (ADS)

Sheung, Janet; Qian, Jun; Sullivan, Joseph; Thomasset, Muriel; Manton, Jonathan; Bean, Sunil; Takacs, Peter; Dvorak, Joseph; Assoufid, Lahsen

2017-09-01

As resolving power targets have increased with each generation of beamlines commissioned in synchrotron radiation facilities worldwide, diffraction gratings are quickly becoming crucial optical components for meeting performance targets. However, the metrology of variable-line-spacing (VLS) gratings for high resolution beamlines is not widespread; in particular, no metrology facility at any US DOE facility is currently equipped to fully characterize such gratings. To begin to address this issue, the Optics Group at the Advanced Photon Source at Argonne, in collaboration with SOLEIL and with support from Brookhaven National Laboratory (BNL), has developed an alternative beam path addition to the Long Trace Profiler (LTP) at Argonne's Advanced Photon Source. This significantly expands the functionality of the LTP not only to measure mirrors surface slope profile at normal incidence, but also to characterize the groove density of VLS diffraction gratings in the Littrow incidence up to 79°, which covers virtually all diffraction gratings used at synchrotrons in the first order. The LTP light source is a 20mW HeNe laser, which yields enough signal for diffraction measurements to be performed on low angle blazed gratings optimized for soft X-ray wavelengths. We will present the design of the beam path, technical requirements for the optomechanics, and our data analysis procedure. Finally, we discuss challenges still to be overcome and potential limitations with use of the LTP to perform metrology on diffraction gratings.

Computer aided manufacturing for complex freeform optics

NASA Astrophysics Data System (ADS)

Wolfs, Franciscus; Fess, Ed; Johns, Dustin; LePage, Gabriel; Matthews, Greg

2017-10-01

Recently, the desire to use freeform optics has been increasing. Freeform optics can be used to expand the capabilities of optical systems and reduce the number of optics needed in an assembly. The traits that increase optical performance also present challenges in manufacturing. As tolerances on freeform optics become more stringent, it is necessary to continue to improve methods for how the grinding and polishing processes interact with metrology. To create these complex shapes, OptiPro has developed a computer aided manufacturing package called PROSurf. PROSurf generates tool paths required for grinding and polishing freeform optics with multiple axes of motion. It also uses metrology feedback for deterministic corrections. ProSurf handles 2 key aspects of the manufacturing process that most other CAM systems struggle with. The first is having the ability to support several input types (equations, CAD models, point clouds) and still be able to create a uniform high-density surface map useable for generating a smooth tool path. The second is to improve the accuracy of mapping a metrology file to the part surface. To perform this OptiPro is using 3D error maps instead of traditional 2D maps. The metrology error map drives the tool path adjustment applied during processing. For grinding, the error map adjusts the tool position to compensate for repeatable system error. For polishing, the error map drives the relative dwell times of the tool across the part surface. This paper will present the challenges associated with these issues and solutions that we have created.

Three-dimensional digital holographic aperture synthesis for rapid and highly-accurate large-volume metrology

NASA Astrophysics Data System (ADS)

Crouch, Stephen; Kaylor, Brant M.; Barber, Zeb W.; Reibel, Randy R.

2015-09-01

Currently large volume, high accuracy three-dimensional (3D) metrology is dominated by laser trackers, which typically utilize a laser scanner and cooperative reflector to estimate points on a given surface. The dependency upon the placement of cooperative targets dramatically inhibits the speed at which metrology can be conducted. To increase speed, laser scanners or structured illumination systems can be used directly on the surface of interest. Both approaches are restricted in their axial and lateral resolution at longer stand-off distances due to the diffraction limit of the optics used. Holographic aperture ladar (HAL) and synthetic aperture ladar (SAL) can enhance the lateral resolution of an imaging system by synthesizing much larger apertures by digitally combining measurements from multiple smaller apertures. Both of these approaches only produce two-dimensional imagery and are therefore not suitable for large volume 3D metrology. We combined the SAL and HAL approaches to create a swept frequency digital holographic 3D imaging system that provides rapid measurement speed for surface coverage with unprecedented axial and lateral resolution at longer standoff ranges. The technique yields a "data cube" of Fourier domain data, which can be processed with a 3D Fourier transform to reveal a 3D estimate of the surface. In this paper, we provide the theoretical background for the technique and show experimental results based on an ultra-wideband frequency modulated continuous wave (FMCW) chirped heterodyne ranging system showing ~100 micron lateral and axial precisions at >2 m standoff distances.

Improving automated 3D reconstruction methods via vision metrology

NASA Astrophysics Data System (ADS)

Toschi, Isabella; Nocerino, Erica; Hess, Mona; Menna, Fabio; Sargeant, Ben; MacDonald, Lindsay; Remondino, Fabio; Robson, Stuart

2015-05-01

This paper aims to provide a procedure for improving automated 3D reconstruction methods via vision metrology. The 3D reconstruction problem is generally addressed using two different approaches. On the one hand, vision metrology (VM) systems try to accurately derive 3D coordinates of few sparse object points for industrial measurement and inspection applications; on the other, recent dense image matching (DIM) algorithms are designed to produce dense point clouds for surface representations and analyses. This paper strives to demonstrate a step towards narrowing the gap between traditional VM and DIM approaches. Efforts are therefore intended to (i) test the metric performance of the automated photogrammetric 3D reconstruction procedure, (ii) enhance the accuracy of the final results and (iii) obtain statistical indicators of the quality achieved in the orientation step. VM tools are exploited to integrate their main functionalities (centroid measurement, photogrammetric network adjustment, precision assessment, etc.) into the pipeline of 3D dense reconstruction. Finally, geometric analyses and accuracy evaluations are performed on the raw output of the matching (i.e. the point clouds) by adopting a metrological approach. The latter is based on the use of known geometric shapes and quality parameters derived from VDI/VDE guidelines. Tests are carried out by imaging the calibrated Portable Metric Test Object, designed and built at University College London (UCL), UK. It allows assessment of the performance of the image orientation and matching procedures within a typical industrial scenario, characterised by poor texture and known 3D/2D shapes.

A standardized non-instrumental tool for characterizing workstations concerned with exposure to engineered nanomaterials

NASA Astrophysics Data System (ADS)

Canu I, Guseva; C, Ducros; S, Ducamp; L, Delabre; S, Audignon-Durand; C, Durand; Y, Iwatsubo; D, Jezewski-Serra; Bihan O, Le; S, Malard; A, Radauceanu; M, Reynier; M, Ricaud; O, Witschger

2015-05-01

The French national epidemiological surveillance program EpiNano aims at surveying mid- and long-term health effects possibly related with occupational exposure to either carbon nanotubes or titanium dioxide nanoparticles (TiO2). EpiNano is limited to workers potentially exposed to these nanomaterials including their aggregates and agglomerates. In order to identify those workers during the in-field industrial hygiene visits, a standardized non-instrumental method is necessary especially for epidemiologists and occupational physicians unfamiliar with nanoparticle and nanomaterial exposure metrology. A working group, Quintet ExpoNano, including national experts in nanomaterial metrology and occupational hygiene reviewed available methods, resources and their practice in order to develop a standardized tool for conducting company industrial hygiene visits and collecting necessary information. This tool, entitled “Onsite technical logbook”, includes 3 parts: company, workplace, and workstation allowing a detailed description of each task, process and exposure surrounding conditions. This logbook is intended to be completed during the company industrial hygiene visit. Each visit is conducted jointly by an industrial hygienist and an epidemiologist of the program and lasts one or two days depending on the company size. When all collected information is computerized using friendly-using software, it is possible to classify workstations with respect to their potential direct and/or indirect exposure. Workers appointed to workstations classified as concerned with exposure are considered as eligible for EpiNano program and invited to participate. Since January 2014, the Onsite technical logbook has been used in ten company visits. The companies visited were mostly involved in research and development. A total of 53 workstations with potential exposure to nanomaterials were pre-selected and observed: 5 with TiO2, 16 with single-walled carbon nanotubes, 27 multiwalled carbon nanotubes. Among the tasks observed there were: nanomaterial characterisation analysis (8), weighing (7), synthesis (6), functionalization (5), and transfer (5). The manipulated quantities were usually very small. After analysis of the data gathered in logbooks, 30 workstations have been classified as concerned with exposure to carbon nanotubes or TiO2. Additional tool validity as well as inter-and intra-evaluator reproducibility studies are ongoing. The first results are promising.

Data fusion for CD metrology: heterogeneous hybridization of scatterometry, CDSEM, and AFM data

NASA Astrophysics Data System (ADS)

Hazart, J.; Chesneau, N.; Evin, G.; Largent, A.; Derville, A.; Thérèse, R.; Bos, S.; Bouyssou, R.; Dezauzier, C.; Foucher, J.

2014-04-01

The manufacturing of next generation semiconductor devices forces metrology tool providers for an exceptional effort in order to meet the requirements for precision, accuracy and throughput stated in the ITRS. In the past years hybrid metrology (based on data fusion theories) has been investigated as a new methodology for advanced metrology [1][2][3]. This paper provides a new point of view of data fusion for metrology through some experiments and simulations. The techniques are presented concretely in terms of equations to be solved. The first point of view is High Level Fusion which is the use of simple numbers with their associated uncertainty postprocessed by tools. In this paper, it is divided into two stages: one for calibration to reach accuracy, the second to reach precision thanks to Bayesian Fusion. From our perspective, the first stage is mandatory before applying the second stage which is commonly presented [1]. However a reference metrology system is necessary for this fusion. So, precision can be improved if and only if the tools to be fused are perfectly matched at least for some parameters. We provide a methodology similar to a multidimensional TMU able to perform this matching exercise. It is demonstrated on a 28 nm node backend lithography case. The second point of view is Deep Level Fusion which works on the contrary with raw data and their combination. In the approach presented here, the analysis of each raw data is based on a parametric model and connections between the parameters of each tool. In order to allow OCD/SEM Deep Level Fusion, a SEM Compact Model derived from [4] has been developed and compared to AFM. As far as we know, this is the first time such techniques have been coupled at Deep Level. A numerical study on the case of a simple stack for lithography is performed. We show strict equivalence of Deep Level Fusion and High Level Fusion when tools are sensitive and models are perfect. When one of the tools can be considered as a reference and the second is biased, High Level Fusion is far superior to standard Deep Level Fusion. Otherwise, only the second stage of High Level Fusion is possible (Bayesian Fusion) and do not provide substantial advantage. Finally, when OCD is equipped with methods for bias detection [5], Deep Level Fusion outclasses the two-stage High Level Fusion and will benefit to the industry for most advanced nodes production.

Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

NASA Astrophysics Data System (ADS)

Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

2016-06-01

Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial measurement for large structure with similar dimension with large deployable reflector to confirm the validity of the network design and instrumentation. In this report, the overview of this R&D project and the results of feasibility study of network design based on simulations on vision metrology and beam pattern compensation of antenna with very large reflector in orbit is discussed. The feasibility of assumed network design for vision metrology and satisfaction of accuracy requirements are discussed. The feasibility of beam pattern compensation by using accurately measured reflector shape is confirmed with antenna pattern simulation for deformed parabola reflector. If reflector surface of communication satellite can be measured routinely in orbit, the antenna pattern can be compensated and maintain the high performance every moment.

Holistic metrology qualification extension and its application to characterize overlay targets with asymmetric effects

NASA Astrophysics Data System (ADS)

Dos Santos Ferreira, Olavio; Sadat Gousheh, Reza; Visser, Bart; Lie, Kenrick; Teuwen, Rachel; Izikson, Pavel; Grzela, Grzegorz; Mokaberi, Babak; Zhou, Steve; Smith, Justin; Husain, Danish; Mandoy, Ram S.; Olvera, Raul

2018-03-01

Ever increasing need for tighter on-product overlay (OPO), as well as enhanced accuracy in overlay metrology and methodology, is driving semiconductor industry's technologists to innovate new approaches to OPO measurements. In case of High Volume Manufacturing (HVM) fabs, it is often critical to strive for both accuracy and robustness. Robustness, in particular, can be challenging in metrology since overlay targets can be impacted by proximity of other structures next to the overlay target (asymmetric effects), as well as symmetric stack changes such as photoresist height variations. Both symmetric and asymmetric contributors have impact on robustness. Furthermore, tweaking or optimizing wafer processing parameters for maximum yield may have an adverse effect on physical target integrity. As a result, measuring and monitoring physical changes or process abnormalities/artefacts in terms of new Key Performance Indicators (KPIs) is crucial for the end goal of minimizing true in-die overlay of the integrated circuits (ICs). IC manufacturing fabs often relied on CD-SEM in the past to capture true in-die overlay. Due to destructive and intrusive nature of CD-SEMs on certain materials, it's desirable to characterize asymmetry effects for overlay targets via inline KPIs utilizing YieldStar (YS) metrology tools. These KPIs can also be integrated as part of (μDBO) target evaluation and selection for final recipe flow. In this publication, the Holistic Metrology Qualification (HMQ) flow was extended to account for process induced (asymmetric) effects such as Grating Imbalance (GI) and Bottom Grating Asymmetry (BGA). Local GI typically contributes to the intrafield OPO whereas BGA typically impacts the interfield OPO, predominantly at the wafer edge. Stack height variations highly impact overlay metrology accuracy, in particular in case of multi-layer LithoEtch Litho-Etch (LELE) overlay control scheme. Introducing a GI impact on overlay (in nm) KPI check quantifies the grating imbalance impact on overlay, whereas optimizing for accuracy using self-reference captures the bottom grating asymmetry effect. Measuring BGA after each process step before exposure of the top grating helps to identify which specific step introduces the asymmetry in the bottom grating. By evaluating this set of KPI's to a BEOL LELE overlay scheme, we can enhance robustness of recipe selection and target selection. Furthermore, these KPIs can be utilized to highlight process and equipment abnormalities. In this work, we also quantified OPO results with a self-contained methodology called Triangle Method. This method can be utilized for LELE layers with a common target and reference. This allows validating general μDBO accuracy, hence reducing the need for CD-SEM verification.

Implementation of machine learning for high-volume manufacturing metrology challenges (Conference Presentation)

NASA Astrophysics Data System (ADS)

Timoney, Padraig; Kagalwala, Taher; Reis, Edward; Lazkani, Houssam; Hurley, Jonathan; Liu, Haibo; Kang, Charles; Isbester, Paul; Yellai, Naren; Shifrin, Michael; Etzioni, Yoav

2018-03-01

In recent years, the combination of device scaling, complex 3D device architecture and tightening process tolerances have strained the capabilities of optical metrology tools to meet process needs. Two main categories of approaches have been taken to address the evolving process needs. In the first category, new hardware configurations are developed to provide more spectral sensitivity. Most of this category of work will enable next generation optical metrology tools to try to maintain pace with next generation process needs. In the second category, new innovative algorithms have been pursued to increase the value of the existing measurement signal. These algorithms aim to boost sensitivity to the measurement parameter of interest, while reducing the impact of other factors that contribute to signal variability but are not influenced by the process of interest. This paper will evaluate the suitability of machine learning to address high volume manufacturing metrology requirements in both front end of line (FEOL) and back end of line (BEOL) sectors from advanced technology nodes. In the FEOL sector, initial feasibility has been demonstrated to predict the fin CD values from an inline measurement using machine learning. In this study, OCD spectra were acquired after an etch process that occurs earlier in the process flow than where the inline CD is measured. The fin hard mask etch process is known to impact the downstream inline CD value. Figure 1 shows the correlation of predicted CD vs downstream inline CD measurement obtained after the training of the machine learning algorithm. For BEOL, machine learning is shown to provide an additional source of information in prediction of electrical resistance from structures that are not compatible for direct copper height measurement. Figure 2 compares the trench height correlation to electrical resistance (Rs) and the correlation of predicted Rs to the e-test Rs value for a far back end of line (FBEOL) metallization level across 3 products. In the case of product C, it is found that the predicted Rs correlation to the e-test value is significantly improved utilizing spectra acquired at the e-test structure. This paper will explore the considerations required to enable use of machine learning derived metrology output to enable improved process monitoring and control. Further results from the FEOL and BEOL sectors will be presented, together with further discussion on future proliferation of machine learning based metrology solutions in high volume manufacturing.

Social profit in the context of the activities at Fluids Measurement Sector in Legal Metrology Department - Inmetro

NASA Astrophysics Data System (ADS)

Cinelli, L. R.; Silva, L. G.; Junior, E. A.; Almeida, R. O.

2018-03-01

This article was prepared in the context of the work of the Fluids Measurement Sector (Seflu) of the Legal Metrology Department of Inmetro (Dimel) in order to try to answer the following question: What is the magnitude of Social Profit generated for brazilian society from the existence of legal control of measuring instruments within the scope of this sector? In this sense, some examples of a case study containing the main measurement instruments related to the evaluation process of models performed at the Seflu are presented.

Polarizability of Helium, Neon, and Argon: New Perspectives for Gas Metrology

NASA Astrophysics Data System (ADS)

Gaiser, Christof; Fellmuth, Bernd

2018-03-01

With dielectric-constant gas thermometry, the molar polarizability of helium, neon, and argon has been determined with relative standard uncertainties of about 2 parts per million. A series of isotherms measured with the three noble gases and two different experimental setups led to this unprecedented level of uncertainty. These data are crucial for scientists in the field of gas metrology, working on pressure and temperature standards. Furthermore, with the new benchmark values for neon and argon, theoretical calculations, today about 3 orders of magnitude larger in uncertainty, can be checked and improved.

Annual Review of Progress in Applied Computational Electromagnetics (5th), Held in Monterey, California on March 20-24 1989

DTIC Science & Technology

1989-01-01

circuit of the field equations of Maxwell ", Proc IRE, vol 32, Kay 1944, pp 360-367. 3. S. Akhtarzad P.B. Johns ,"Solution of Maxwell’s equations in three...ELFCTROMAGNETICS APPLIED TO INTEGRATED CIRCUIT MICROLITHOGRAPHY AND METROLOGY John C . Mould Jr. & Gregory L Wojc* Welinger Associates, 4410 El Camino Real, Los...1AICROLITHOGRAPHY AND METROLOGY John C . Mould Jr. & Gregory L Wo c * Weldlinger Associates, 4410 El Camino Real. Los Allos, Ca. 94022 1. Pholoreslat

Polarizability of Helium, Neon, and Argon: New Perspectives for Gas Metrology.

PubMed

Gaiser, Christof; Fellmuth, Bernd

2018-03-23

With dielectric-constant gas thermometry, the molar polarizability of helium, neon, and argon has been determined with relative standard uncertainties of about 2 parts per million. A series of isotherms measured with the three noble gases and two different experimental setups led to this unprecedented level of uncertainty. These data are crucial for scientists in the field of gas metrology, working on pressure and temperature standards. Furthermore, with the new benchmark values for neon and argon, theoretical calculations, today about 3 orders of magnitude larger in uncertainty, can be checked and improved.

Metrological challenges for measurements of key climatological observables Part 2: oceanic salinity

NASA Astrophysics Data System (ADS)

Pawlowicz, R.; Feistel, R.; McDougall, T. J.; Ridout, P.; Seitz, S.; Wolf, H.

2016-02-01

Salinity is a key variable in the modelling and observation of ocean circulation and ocean-atmosphere fluxes of heat and water. In this paper, we examine the climatological relevance of ocean salinity, noting fundamental deficiencies in the definition of this key observable, and its lack of a secure foundation in the International System of Units, the SI. The metrological history of salinity is reviewed, problems with its current definitions and measurement practices are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10.

Quantum Metrology Assisted by Abstention

NASA Astrophysics Data System (ADS)

Gendra, B.; Ronco-Bonvehi, E.; Calsamiglia, J.; Muñoz-Tapia, R.; Bagan, E.

2013-03-01

The main goal of quantum metrology is to obtain accurate values of physical parameters using quantum probes. In this context, we show that abstention, i.e., the possibility of getting an inconclusive answer at readout, can drastically improve the measurement precision and even lead to a change in its asymptotic behavior, from the shot-noise to the Heisenberg scaling. We focus on phase estimation and quantify the required amount of abstention for a given precision. We also develop analytical tools to obtain the asymptotic behavior of the precision and required rate of abstention for arbitrary pure states.

Metrology system for the Terrestrial Planet Finder Coronagraph

NASA Technical Reports Server (NTRS)

Shaklin, Stuart; Marchen, Luis; Zhao, Feng; Peters, Robert D.; Ho, Tim; Holmes, Buck

2004-01-01

The Terrestrial Planet Finder (TPF) employs an aggressive coronagraph designed to obtain better than 1e-10 contrast inside the third Airy ring. Minute changes in low-order aberration content scatter significant light at this position. One implication is the requirement to control low-order aberrations induced by motion of the secondary mirror relative to the primary mirror; sub-nanometer relative positional stability is required. We propose a 6-beam laser truss to monitor the relative positions of the two mirrors. The truss is based on laser metrology developed for the Space Interferometry Mission.

Metrology in health: a pilot study

NASA Astrophysics Data System (ADS)

Ferreira, M.; Matos, A.

2015-02-01

The purpose of this paper is to identify and analyze some relevant issues which arise when the concept of metrological traceability is applied to health care facilities. Discussion is structured around the results that were obtained through a characterization and comparative description of the practices applied in 45 different Portuguese health entities. Following a qualitative exploratory approach, the information collected was the support for the initial research hypotheses and the development of the questionnaire survey. It was also applied a quantitative methodology that included a descriptive and inferential statistical analysis of the experimental data set.

Optical Fabrication and Measurement AXAF and CIRS

NASA Technical Reports Server (NTRS)

Engelhaupt, Darell

1997-01-01

This paper presents a final report on Optical Fabrication and Measurement AXAF (Advanced X-Ray Astrophysics Facility) and CIRS (Composite Infrared Spectrometer) from July 12, 1994 to August 16, 1996.. This paper includes specific tasks to be performed. The tasks are as follows: 1) Preparation and Characterization of Zerodur Glass Samples; 2) Develop and Fabricate AXAF and CIRS Metrology Tooling; 3) Update AXAF Technical Data Base; and 4) Perform Fabrication Related Metrology Tasks for CIRS. This paper also includes final activities from the July, 1996 report to August 1996.

12th US-Japan Seminar: Many Body Quantum Systems from Quantum Gases to Metrology and Information Processing. Held in Madison, Wisconsin on 20-24 September 2015

DTIC Science & Technology

2016-06-03

Ultracold Atoms 5:10 Zelevinsky Ye Inouye High-precision spectroscopy with two-body quantum systems Low entropy quantum gas of polar molecules New limit...12th US-Japan Seminar: Many Body Quantum Systems from Quantum Gases to Metrology and Information Processing Support was provided for The 12th US...Japan Seminar on many body quantum systems which was held in Madison, Wisconsin from September 20 to 24, 2015 at the Monona Terrace Convention Center

Spectroscopic metrology for isotope composition measurements and transfer standards

NASA Astrophysics Data System (ADS)

Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

2017-04-01

The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H/1H ratios in CH4. Here, based on HIGHGAS project results, we present OTSs for atmospheric CO2 and CO measurements. The results delivered by the OTSs are in excellent agreement with gravimetric values of metrological "primary" static gas standards. The repeatabilities of the OTS results are matching the compatibility goals stated by WMO for atmospheric CO2 and CO measurements. In addition, we present OIRS measurement methods and procedures to demonstrate their applicability and validation. The requirements on, e.g. absorption line data quality and temperature sensitivity of isotope ratio, are discussed. Uncertainty budgets are presented and the traceability of the results is addressed. The current limitations in our measurements are discussed and steps taken to address these limitations are presented. Acknowledgement Parts of this work have been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] EMRP project ENV52-HIGHGAS, available at: http://www.euramet.org/ [2] Prosenjit Ghosh, Willi A. Brand, International Journal of Mass Spectrometry 228, 1-33 (2003).

Investigation of hyper-NA scanner emulation for photomask CDU performance

NASA Astrophysics Data System (ADS)

Poortinga, Eric; Scheruebl, Thomas; Conley, Will; Sundermann, Frank

2007-02-01

As the semiconductor industry moves toward immersion lithography using numerical apertures above 1.0 the quality of the photomask becomes even more crucial. Photomask specifications are driven by the critical dimension (CD) metrology within the wafer fab. Knowledge of the CD values at resist level provides a reliable mechanism for the prediction of device performance. Ultimately, tolerances of device electrical properties drive the wafer linewidth specifications of the lithography group. Staying within this budget is influenced mainly by the scanner settings, resist process, and photomask quality. Tightening of photomask specifications is one mechanism for meeting the wafer CD targets. The challenge lies in determining how photomask level metrology results influence wafer level imaging performance. Can it be inferred that photomask level CD performance is the direct contributor to wafer level CD performance? With respect to phase shift masks, criteria such as phase and transmission control are generally tightened with each technology node. Are there other photomask relevant influences that effect wafer CD performance? A comprehensive study is presented supporting the use of scanner emulation based photomask CD metrology to predict wafer level within chip CD uniformity (CDU). Using scanner emulation with the photomask can provide more accurate wafer level prediction because it inherently includes all contributors to image formation related to the 3D topography such as the physical CD, phase, transmission, sidewall angle, surface roughness, and other material properties. Emulated images from different photomask types were captured to provide CD values across chip. Emulated scanner image measurements were completed using an AIMS TM45-193i with its hyper-NA, through-pellicle data acquisition capability including the Global CDU Map TM software option for AIMS TM tools. The through-pellicle data acquisition capability is an essential prerequisite for capturing final CDU data (after final clean and pellicle mounting) before the photomask ships or for re-qualification at the wafer fab. Data was also collected on these photomasks using a conventional CD-SEM metrology system with the pellicles removed. A comparison was then made to wafer prints demonstrating the benefit of using scanner emulation based photomask CD metrology.

Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goldberg, Kenneth A.; Yashchuk, Valeriy

2007-12-01

What is the point of developing new high-brightness light sources if beamline optics won't be available to realize the goals of nano-focusing and coherence preservation? That was one of the central questions raised during a workshop at the 2007 Advanced Light Source Users Meeting. Titled, 'Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation', the workshop was organized by Kenneth Goldberg and Valeriy Yashchuk (both of Lawrence Berkeley National Laboratory, LBNL), and it brought together industry representatives and researchers from Japan, Europe, and the US to discuss the state of the art and to outline the optics requirements of newmore » light sources. Many of the presentations are viewable on the workshop website http://goldberg.lbl.gov/MetrologyWorkshop07/. Many speakers shared the same view of one of the most significant challenges facing the development of new high-brightness third and fourth generation x-ray, soft x-ray, and EUV light sources: these sources place extremely high demands on the surface quality of beamline optics. In many cases, the 1-2-nm surface error specs that define the outer bounds of 'diffraction-limited' quality are beyond the reach of leading facilities and optics vendors. To focus light to 50-nm focal spots, or smaller, from reflective optics and to preserve the high coherent flux that new sources make possible, the optical surface quality and alignment tolerances must be measured in nano-meters and nano-radians. Without a significant, well-supported research effort, including the development of new metrology techniques for use both on and off the beamline, these goals will likely not be met. The scant attention this issue has garnered is evident in the stretched budgets and limited manpower currently dedicated to metrology. With many of the world's leading groups represented at the workshop, it became clear that Japan and Europe are several steps ahead of the US in this critical area. But the situation isn't all dire: several leading groups are blazing a trail forward, and the recognition of this issue is increasing. The workshop featured eleven invited talks whose presenters came from Japan, Europe, and the US.« less

Investigation of phase distribution using Phame® in-die phase measurements

NASA Astrophysics Data System (ADS)

Buttgereit, Ute; Perlitz, Sascha

2009-03-01

As lithography mask processes move toward 45nm and 32nm node, mask complexity increases steadily, mask specifications tighten and process control becomes extremely important. Driven by this fact the requirements for metrology tools increase as well. Efforts in metrology have been focused on accurately measuring CD linearity and uniformity across the mask, and accurately measuring phase variation on Alternating/Attenuated PSM and transmission for Attenuated PSM. CD control on photo masks is usually done through the following processes: exposure dose/focus change, resist develop and dry etch. The key requirement is to maintain correct CD linearity and uniformity across the mask. For PSM specifically, the effect of CD uniformity for both Alternating PSM and Attenuated PSM and etch depth for Alternating PSM becomes also important. So far phase measurement has been limited to either measuring large-feature phase using interferometer-based metrology tools or measuring etch depth using AFM and converting etch depth into phase under the assumption that trench profile and optical properties of the layers remain constant. However recent investigations show that the trench profile and optical property of layers impact the phase. This effect is getting larger for smaller CD's. The currently used phase measurement methods run into limitations because they are not able to capture 3D mask effects, diffraction limitations or polarization effects. The new phase metrology system - Phame(R) developed by Carl Zeiss SMS overcomes those limitations and enables laterally resolved phase measurement in any kind of production feature on the mask. The resolution of the system goes down to 120nm half pitch at mask level. We will report on tool performance data with respect to static and dynamic phase repeatability focusing on Alternating PSM. Furthermore the phase metrology system was used to investigate mask process signatures on Alternating PSM in order to further improve the overall PSM process performance. Especially global loading effects caused by the pattern density and micro loading effects caused by the feature size itself have been evaluated using the capability of measuring phase in the small production features. The results of this study will be reported in this paper.

Temperature metrology

NASA Astrophysics Data System (ADS)

Fischer, J.; Fellmuth, B.

2005-05-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national units. For the base unit kelvin, this procedure is described in the sections on practical temperature scales, practical thermometry and reference standards. Testing experimentally the fundamental laws of physics means in practice the precise determination of the fundamental constants appearing in the laws. The essence of current activities is that prototypes, which may vary uncontrollably with time and location, are replaced by abstract experimental prescriptions that relate the units to the constants. This approach is shown for the definition of the kelvin and the Boltzmann constant. Dedicated to the occasion of the 60th birthday of Wolfgang Buck.

Investigation into the use of smartphone as a machine vision device for engineering metrology and flaw detection, with focus on drilling

NASA Astrophysics Data System (ADS)

Razdan, Vikram; Bateman, Richard

2015-05-01

This study investigates the use of a Smartphone and its camera vision capabilities in Engineering metrology and flaw detection, with a view to develop a low cost alternative to Machine vision systems which are out of range for small scale manufacturers. A Smartphone has to provide a similar level of accuracy as Machine Vision devices like Smart cameras. The objective set out was to develop an App on an Android Smartphone, incorporating advanced Computer vision algorithms written in java code. The App could then be used for recording measurements of Twist Drill bits and hole geometry, and analysing the results for accuracy. A detailed literature review was carried out for in-depth study of Machine vision systems and their capabilities, including a comparison between the HTC One X Android Smartphone and the Teledyne Dalsa BOA Smart camera. A review of the existing metrology Apps in the market was also undertaken. In addition, the drilling operation was evaluated to establish key measurement parameters of a twist Drill bit, especially flank wear and diameter. The methodology covers software development of the Android App, including the use of image processing algorithms like Gaussian Blur, Sobel and Canny available from OpenCV software library, as well as designing and developing the experimental set-up for carrying out the measurements. The results obtained from the experimental set-up were analysed for geometry of Twist Drill bits and holes, including diametrical measurements and flaw detection. The results show that Smartphones like the HTC One X have the processing power and the camera capability to carry out metrological tasks, although dimensional accuracy achievable from the Smartphone App is below the level provided by Machine vision devices like Smart cameras. A Smartphone with mechanical attachments, capable of image processing and having a reasonable level of accuracy in dimensional measurement, has the potential to become a handy low-cost Machine vision system for small scale manufacturers, especially in field metrology and flaw detection.

web-based interactive data processing: application to stable isotope metrology.

PubMed

Verkouteren, R M; Lee, J N

2001-08-01

To address a fundamental need in stable isotope metrology, the National Institute of Standards and Technology (NIST) has established a web-based interactive data-processing system accessible through a common gateway interface (CGI) program on the internet site http://www. nist.gov/widps-co2. This is the first application of a web-based tool that improves the measurement traceability afforded by a series of NIST standard materials. Specifically, this tool promotes the proper usage of isotope reference materials (RMs) and improves the quality of reported data from extensive measurement networks. Through the International Atomic Energy Agency (IAEA), we have defined standard procedures for stable isotope measurement and data-processing, and have determined and applied consistent reference values for selected NIST and IAEA isotope RMs. Measurement data of samples and RMs are entered into specified fields on the web-based form. These data are submitted through the CGI program on a NIST Web server, where appropriate calculations are performed and results returned to the client. Several international laboratories have independently verified the accuracy of the procedures and algorithm for measurements of naturally occurring carbon-13 and oxygen-18 abundances and slightly enriched compositions up to approximately 150% relative to natural abundances. To conserve the use of the NIST RMs, users may determine value assignments for a secondary standard to be used in routine analysis. Users may also wish to validate proprietary algorithms embedded in their laboratory instrumentation, or specify the values of fundamental variables that are usually fixed in reduction algorithms to see the effect on the calculations. The results returned from the web-based tool are limited in quality only by the measurements themselves, and further value may be realized through the normalization function. When combined with stringent measurement protocols, two- to threefold improvements have been realized in the reproducibility of carbon-13 and oxygen-18 determinations across laboratories.

Calibration, Sensor Model Improvements and Uncertainty Budget of the Airborne Imaging Spectrometer APEX

NASA Astrophysics Data System (ADS)

Hueni, A.

2015-12-01

ESA's Airborne Imaging Spectrometer APEX (Airborne Prism Experiment) was developed under the PRODEX (PROgramme de Développement d'EXpériences scientifiques) program by a Swiss-Belgian consortium and entered its operational phase at the end of 2010 (Schaepman et al., 2015). Work on the sensor model has been carried out extensively within the framework of European Metrology Research Program as part of the Metrology for Earth Observation and Climate (MetEOC and MetEOC2). The focus has been to improve laboratory calibration procedures in order to reduce uncertainties, to establish a laboratory uncertainty budget and to upgrade the sensor model to compensate for sensor specific biases. The updated sensor model relies largely on data collected during dedicated characterisation experiments in the APEX calibration home base but includes airborne data as well where the simulation of environmental conditions in the given laboratory setup was not feasible. The additions to the model deal with artefacts caused by environmental changes and electronic features, namely the impact of ambient air pressure changes on the radiometry in combination with dichroic coatings, influences of external air temperatures and consequently instrument baffle temperatures on the radiometry, and electronic anomalies causing radiometric errors in the four shortwave infrared detector readout blocks. Many of these resolved issues might be expected to be present in other imaging spectrometers to some degree or in some variation. Consequently, the work clearly shows the difficulties of extending a laboratory-based uncertainty to data collected under in-flight conditions. The results are hence not only of interest to the calibration scientist but also to the spectroscopy end user, in particular when commercial sensor systems are used for data collection and relevant sensor characteristic information tends to be sparse. Schaepman, et al, 2015. Advanced radiometry measurements and Earth science applications with the Airborne Prism Experiment (APEX). RSE, 158, 207-219.

Metrological issues related to BRDF measurements around the specular direction in the particular case of glossy surfaces

NASA Astrophysics Data System (ADS)

Obein, Gaël.; Audenaert, Jan; Ged, Guillaume; Leloup, Frédéric B.

2015-03-01

Among the complete bidirectional reflectance distribution function (BRDF), visual gloss is principally related to physical reflection characteristics located around the specular reflection direction. This particular part of the BRDF is usually referred to as the specular peak. A good starting point for the physical description of gloss could be to measure the reflection properties around this specular peak. Unfortunately, such a characterization is not trivial, since for glossy surfaces the width of the specular peak can become very narrow (typically a full width at half maximum inferior to 0.5° is encountered). In result, new BRDF measurement devices with a very small solid angle of detection are being introduced. Yet, differences in the optical design of BRDF measurement instruments engender different measurement results for the same specimen, complicating direct comparison of the measurement results. This issue is addressed in this paper. By way of example, BRDF measurement results of two samples, one being matte and the other one glossy, obtained by use of two high level goniospectrophotometers with a different optical design, are described. Important discrepancies in the results of the glossy sample are discussed. Finally, luminance maps obtained from renderings with the acquired BRDF data are presented, exemplifying the large visual differences that might be obtained. This stresses the metrological aspects that must be known for using BRDF data. Indeed, the comprehension of parameters affecting the measurement results is an inevitable step towards progress in the metrology of surface gloss, and thus towards a better metrology of appearance in general.

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Maas, D. J., E-mail: diederik.maas@tno.nl; Herfst, R.; Veldhoven, E. van

2015-10-15

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate samplemore » charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.« less

Target-Tracking Camera for a Metrology System

NASA Technical Reports Server (NTRS)

Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

2009-01-01

An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

A hybrid 2D/3D inspection concept with smart routing optimisation for high throughput, high dynamic range and traceable critical dimension metrology

NASA Astrophysics Data System (ADS)

Jones, Christopher W.; O’Connor, Daniel

2018-07-01

Dimensional surface metrology is required to enable advanced manufacturing process control for products such as large-area electronics, microfluidic structures, and light management films, where performance is determined by micrometre-scale geometry or roughness formed over metre-scale substrates. While able to perform 100% inspection at a low cost, commonly used 2D machine vision systems are insufficient to assess all of the functionally relevant critical dimensions in such 3D products on their own. While current high-resolution 3D metrology systems are able to assess these critical dimensions, they have a relatively small field of view and are thus much too slow to keep up with full production speeds. A hybrid 2D/3D inspection concept is demonstrated, combining a small field of view, high-performance 3D topography-measuring instrument with a large field of view, high-throughput 2D machine vision system. In this concept, the location of critical dimensions and defects are first registered using the 2D system, then smart routing algorithms and high dynamic range (HDR) measurement strategies are used to efficiently acquire local topography using the 3D sensor. A motion control platform with a traceable position referencing system is used to recreate various sheet-to-sheet and roll-to-roll inline metrology scenarios. We present the artefacts and procedures used to calibrate this hybrid sensor system for traceable dimensional measurement, as well as exemplar measurement of optically challenging industrial test structures.

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

NASA Astrophysics Data System (ADS)

Maas, D. J.; Fliervoet, T.; Herfst, R.; van Veldhoven, E.; Meessen, J.; Vaenkatesan, V.; Sadeghian, H.

2015-10-01

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate sample charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.

Comparison of contact and non-contact asphere surface metrology devices

NASA Astrophysics Data System (ADS)

DeFisher, Scott; Fess, Edward M.

2013-09-01

Metrology of asphere surfaces is critical in the precision optics industry. Surface metrology serves as feedback into deterministic grinding and polishing platforms. Many different techniques and devices are used to qualify an asphere surface during fabrication. A contact profilometer is one of the most common measurement technologies used in asphere manufacturing. A profilometer uses a fine stylus to drag a diamond or ruby tip over the surface, resulting in a high resolution curved profile. Coordinate measuring machines (CMM) apply a similar concept by touching the optic with a ruby or silicon carbine sphere. A CMM is able to move in three dimensions while collecting data points along the asphere surface. Optical interferometers use a helium-neon laser with transmission spheres to compare a reflected wavefront from an asphere surface to a reference spherical wavefront. Large departure aspheres can be measured when a computer generated hologram (CGH) is introduced between the interferometer and the optic. OptiPro Systems has developed a non-contact CMM called UltraSurf. It utilizes a single point non-contact sensor, and high accuracy air bearings. Several different commercial non-contact sensors have been integrated, allowing for the flexibility to measure a variety of surfaces and materials. Metrology of a sphere and an asphere using a profilometer, CMM, Interferometer with a CGH, and the UltraSurf will be presented. Cross-correlation of the measured surface error magnitude and shape will be demonstrated. Comparisons between the techniques and devices will be also presented with attention to accuracy, repeatability, and overall measurement time.

Microfabricated Tactile Sensors for Biomedical Applications: A Review

PubMed Central

Saccomandi, Paola; Schena, Emiliano; Oddo, Calogero Maria; Zollo, Loredana; Silvestri, Sergio; Guglielmelli, Eugenio

2014-01-01

During the last decades, tactile sensors based on different sensing principles have been developed due to the growing interest in robotics and, mainly, in medical applications. Several technological solutions have been employed to design tactile sensors; in particular, solutions based on microfabrication present several attractive features. Microfabrication technologies allow for developing miniaturized sensors with good performance in terms of metrological properties (e.g., accuracy, sensitivity, low power consumption, and frequency response). Small size and good metrological properties heighten the potential role of tactile sensors in medicine, making them especially attractive to be integrated in smart interfaces and microsurgical tools. This paper provides an overview of microfabricated tactile sensors, focusing on the mean principles of sensing, i.e., piezoresistive, piezoelectric and capacitive sensors. These sensors are employed for measuring contact properties, in particular force and pressure, in three main medical fields, i.e., prosthetics and artificial skin, minimal access surgery and smart interfaces for biomechanical analysis. The working principles and the metrological properties of the most promising tactile, microfabricated sensors are analyzed, together with their application in medicine. Finally, the new emerging technologies in these fields are briefly described. PMID:25587432

Optics for Processes, Products and Metrology

NASA Astrophysics Data System (ADS)

Mather, George

1999-04-01

Optical physics has a variety of applications in industry, including process inspection, coatings development, vision instrumentation, spectroscopy, and many others. Optics has been used extensively in the design of solar energy collection systems and coatings, for example. Also, with the availability of good CCD cameras and fast computers, it has become possible to develop real-time inspection and metrology devices that can accommodate the high throughputs encountered in modern production processes. More recently, developments in moiré interferometry show great promise for applications in the basic metals and electronics industries. The talk will illustrate applications of optics by discussing process inspection techniques for defect detection, part dimensioning, birefringence measurement, and the analysis of optical coatings in the automotive, glass, and optical disc industries. In particular, examples of optical techniques for the quality control of CD-R, MO, and CD-RW discs will be presented. In addition, the application of optical concepts to solar energy collector design and to metrology by moiré techniques will be discussed. Finally, some of the modern techniques and instruments used for qualitative and quantitative material analysis will be presented.

Graphene-based quantum Hall resistance standards grown by chemical vapor deposition on silicon carbide

NASA Astrophysics Data System (ADS)

Ribeiro-Palau, Rebeca; Lafont, Fabien; Kazazis, Dimitris; Michon, Adrien; Couturaud, Olivier; Consejo, Christophe; Jouault, Benoit; Poirier, Wilfrid; Schopfer, Felicien

2015-03-01

Replace GaAs-based quantum Hall resistance standards (GaAs-QHRS) by a more convenient one, based on graphene (Gr-QHRS), is an ongoing goal in metrology. The new Gr-QHRS are expected to work in less demanding experimental conditions than GaAs ones. It will open the way to a broad dissemination of quantum standards, potentially towards industrial end-users, and it will support the implementation of a new International System of Units based on fixed fundamental constants. Here, we present accurate quantum Hall resistance measurements in large graphene Hall bars, grown by the hybrid scalable technique of propane/hydrogen chemical vapor deposition (CVD) on silicon carbide (SiC). This new Gr-QHRS shows a relative accuracy of 1 ×10-9 of the Hall resistance under the lowest magnetic field ever achieved in graphene. These experimental conditions surpass those of the most wildely used GaAs-QHRS. These results confirm the promises of graphene for resistance metrology applications and emphasizes the quality of the graphene produced by the CVD on SiC for applications as demanding as the resistance metrology.

Microwave evaluation of electromigration susceptibility in advanced interconnects

NASA Astrophysics Data System (ADS)

Sunday, Christopher E.; Veksler, Dmitry; Cheung, Kin C.; Obeng, Yaw S.

2017-11-01

Traditional metrology has been unable to adequately address the needs of the emerging integrated circuits (ICs) at the nano scale; thus, new metrology and techniques are needed. For example, the reliability challenges in fabrication need to be well understood and controlled to facilitate mass production of through-substrate-via (TSV) enabled three-dimensional integrated circuits (3D-ICs). This requires new approaches to the metrology. In this paper, we use the microwave propagation characteristics to study the reliability issues that precede the physical damage caused by electromigration in the Cu-filled TSVs. The pre-failure microwave insertion losses and group delay are dependent on both the device temperature and the amount of current forced through the devices-under-test. The microwave insertion losses increase with the increase in the test temperature, while the group delay increases with the increase in the forced direct current magnitude. The microwave insertion losses are attributed to the defect mobility at the Cu-TiN interface, and the group delay changes are due to resistive heating in the interconnects, which perturbs the dielectric properties of the cladding dielectrics of the copper fill in the TSVs.

Optimization of pencil beam f-theta lens for high-accuracy metrology

NASA Astrophysics Data System (ADS)

Peng, Chuanqian; He, Yumei; Wang, Jie

2018-01-01

Pencil beam deflectometric profilers are common instruments for high-accuracy surface slope metrology of x-ray mirrors in synchrotron facilities. An f-theta optical system is a key optical component of the deflectometric profilers and is used to perform the linear angle-to-position conversion. Traditional optimization procedures of the f-theta systems are not directly related to the angle-to-position conversion relation and are performed with stops of large size and a fixed working distance, which means they may not be suitable for the design of f-theta systems working with a small-sized pencil beam within a working distance range for ultra-high-accuracy metrology. If an f-theta system is not well-designed, aberrations of the f-theta system will introduce many systematic errors into the measurement. A least-squares' fitting procedure was used to optimize the configuration parameters of an f-theta system. Simulations using ZEMAX software showed that the optimized f-theta system significantly suppressed the angle-to-position conversion errors caused by aberrations. Any pencil-beam f-theta optical system can be optimized with the help of this optimization method.

Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

NASA Astrophysics Data System (ADS)

Bösemann, Werner

2016-06-01

New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

Microfabricated tactile sensors for biomedical applications: a review.

PubMed

Saccomandi, Paola; Schena, Emiliano; Oddo, Calogero Maria; Zollo, Loredana; Silvestri, Sergio; Guglielmelli, Eugenio

2014-12-01

During the last decades, tactile sensors based on different sensing principles have been developed due to the growing interest in robotics and, mainly, in medical applications. Several technological solutions have been employed to design tactile sensors; in particular, solutions based on microfabrication present several attractive features. Microfabrication technologies allow for developing miniaturized sensors with good performance in terms of metrological properties (e.g., accuracy, sensitivity, low power consumption, and frequency response). Small size and good metrological properties heighten the potential role of tactile sensors in medicine, making them especially attractive to be integrated in smart interfaces and microsurgical tools. This paper provides an overview of microfabricated tactile sensors, focusing on the mean principles of sensing, i.e., piezoresistive, piezoelectric and capacitive sensors. These sensors are employed for measuring contact properties, in particular force and pressure, in three main medical fields, i.e., prosthetics and artificial skin, minimal access surgery and smart interfaces for biomechanical analysis. The working principles and the metrological properties of the most promising tactile, microfabricated sensors are analyzed, together with their application in medicine. Finally, the new emerging technologies in these fields are briefly described.

Scatterometry-based metrology for SAQP pitch walking using virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-03-01

Advanced technology nodes, 10nm and beyond, employing multi-patterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. Self-Aligned Quadruple Patterning (SAQP) process is used to create the Fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bares compounding effects from successive Reactive Ion Etch (RIE) and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes which work on an assumption that there is consistent spacing between fins. In SAQP there are 3 pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology such as Transmission Electron Microscopy (TEM). In this paper we will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-10-01

Advanced technology nodes, 10 nm and beyond, employing multipatterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. A self-aligned quadruple patterning (SAQP) process is used to create the fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bears the compounding effects from successive reactive ion etch and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes, which work on an assumption that there is consistent spacing between fins. In SAQP, there are three pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology, such as transmission electron microscopy. We will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

A new ultra-high-accuracy angle generator: current status and future direction

NASA Astrophysics Data System (ADS)

Guertin, Christian F.; Geckeler, Ralf D.

2017-09-01

Lack of an extreme high-accuracy angular positioning device available in the United States has left a gap in industrial and scientific efforts conducted there, requiring certain user groups to undertake time-consuming work with overseas laboratories. Specifically, in x-ray mirror metrology the global research community is advancing the state-of-the-art to unprecedented levels. We aim to fill this U.S. gap by developing a versatile high-accuracy angle generator as a part of the national metrology tool set for x-ray mirror metrology and other important industries. Using an established calibration technique to measure the errors of the encoder scale graduations for full-rotation rotary encoders, we implemented an optimized arrangement of sensors positioned to minimize propagation of calibration errors. Our initial feasibility research shows that upon scaling to a full prototype and including additional calibration techniques we can expect to achieve uncertainties at the level of 0.01 arcsec (50 nrad) or better and offer the immense advantage of a highly automatable and customizable product to the commercial market.