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Sample records for mo-si mo-ge w-si

  1. MoSi2-Base Composites

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    2003-01-01

    Addition of 30 to 50 vol% of Si3N4 particulate to MoSi2 eliminated its low temperature catastrophic failure, improved room temperature fracture toughness and the creep resistance. The hybrid composite SCS-6/MoSi2-Si3N4 did not show any matrix cracking and exhibited excellent mechanical and environmental properties. Hi-Nicalon continuous fiber reinforced MoSi2-Si3N4 also showed good strength and toughness. A new MoSi2-base composite containing in-situ whisker-type (Beta)Si3N4 grains in a MoSi2 matrix is also described.

  2. Mo-Si alloy development

    SciTech Connect

    Liu, C.T.; Heatherly, L.; Wright, J.L.

    1996-06-01

    The objective of this task is to develop new-generation corrosion-resistant Mo-Si intermetallic alloys as hot components in advanced fossil energy conversion and combustion systems. The initial effort is devoted to Mo{sub 5}-Si{sub 3}-base (MSB) alloys containing boron additions. Three MSB alloys based on Mo-10.5Si-1.1B (wt %), weighing 1500 g were prepared by hot pressing of elemental and alloy powders at temperatures to 1600{degrees}C in vacuum. Microporosities and glassy-phase (probably silicate phases) formations are identified as the major concerns for preparation of MSB alloys by powder metallurgy. Suggestions are made to alleviate the problems of material processing.

  3. Mo-Si-B Alloy Development

    SciTech Connect

    Schneibel, J.H.; Kruzie, J.J.; Ritchie, R.O.

    2003-04-24

    Mo-Si-B silicides consisting of the phases {alpha}-Mo (Mo solid solution), Mo{sub 3}Si, and Mo{sub 5}SiB{sub 2} have melting points on the order of 2000 C and have potential as ultra-high temperature structural materials. Mo-Si-B alloys can be processed such that the {alpha}-Mo is present in the form of isolated particles in a silicide matrix, or as a continuous matrix ''cementing'' individual silicide particles together. The latter microstructure is similar to that of WC-Co hard metals. This paper focuses on the relationship between the topology as well as scale of the microstructure of Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} alloys, and their creep strength and fracture toughness. For example, the creep strength of Mo-Si-B alloys is improved by reducing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase discontinuous. The fracture toughness is improved by increasing the {alpha}-Mo volume fraction and by making the {alpha}-Mo phase continuous. Room temperature stress intensity factors as high as 21 MPa m{sup 1/2} were obtained. The room temperature fracture toughness of Mo-Si-B alloys can also be improved by microalloying with Zr. The room temperature ductility of Mo itself can be improved by adding MgAl{sub 2}O{sub 4} spinel particles suggesting yet another way to improve the ductile phase toughening of Mo-Si-B alloys.

  4. Tunable transport in magnetically coupled MoGe/permalloy hybrids.

    SciTech Connect

    Belkin, A.; Novosad, V.; Iavarone, M.; Fedor, J.; Pearson, J.; Petrean-Troncalli, A.; Karapetrov, G.; Materials Science Division; Illinois Inst. of Tech.; Austin Coll.

    2008-08-18

    We demonstrate controlled magnetotransport anisotropy of magnetically coupled superconductor-ferromagnet MoGe/Permalloy hybrids. The rotatable anisotropy Permalloy ferromagnet with stripe domain structure induces in-plane anisotropy in superconducting order parameter. We show that near the superconductor-normal state phase boundary the superconductivity in MoGe is localized in narrow mesoscopic channels just above the magnetic domain walls. Changing the in-plane direction of magnetic stripe domains it is possible to reconfigure the direction of the superconducting channels and controllably rotate the direction of the in-plane anisotropy axis in the superconductor.

  5. Adsorption of oxygen atom on MoSi2 (110) surface

    NASA Astrophysics Data System (ADS)

    Sun, S. P.; Li, X. P.; Wang, H. J.; Jiang, Y.; Yi, D. Q.

    2016-09-01

    The adsorption energy, structural relaxation and electronic properties of oxygen atom on MoSi2 (110) surface have been investigated by first-principles calculations. The energetic stability of MoSi2 low-index surfaces was analyzed, and the results suggested that MoSi2 (110) surface had energetically stability. The site of oxygen atom adsorbed on MoSi2 (110) surface were discussed, and the results indicated that the preference adsorption site of MoSi2 (110) surface for oxygen atom was H site (hollow position). Our calculated work should help to understand further the interaction between oxygen atoms and MoSi2 surfaces.

  6. Mo-Si-B-Based Coatings for Ceramic Base Substrates

    NASA Technical Reports Server (NTRS)

    Perepezko, John Harry (Inventor); Sakidja, Ridwan (Inventor); Ritt, Patrick (Inventor)

    2015-01-01

    Alumina-containing coatings based on molybdenum (Mo), silicon (Si), and boron (B) ("MoSiB coatings") that form protective, oxidation-resistant scales on ceramic substrate at high temperatures are provided. The protective scales comprise an aluminoborosilicate glass, and may additionally contain molybdenum. Two-stage deposition methods for forming the coatings are also provided.

  7. Anisotropy of heat conduction in Mo/Si multilayers

    SciTech Connect

    Medvedev, V. V.; Yakshin, A. E.; Kruijs, R. W. E. van de; Bijkerk, F.; Yang, J.; Schmidt, A. J.; Zoethout, E.

    2015-08-28

    This paper reports on the studies of anisotropic heat conduction phenomena in Mo/Si multilayers with individual layer thicknesses selected to be smaller than the mean free path of heat carriers. We applied the frequency-domain thermoreflectance technique to characterize the thermal conductivity tensor. While the mechanisms of the cross-plane heat conduction were studied in detail previously, here we focus on the in-plane heat conduction. To analyze the relative contribution of electron transport to the in-plane heat conduction, we applied sheet-resistance measurements. Results of Mo/Si multilayers with variable thickness of the Mo layers indicate that the net in-plane thermal conductivity depends on the microstructure of the Mo layers.

  8. Anisotropy of heat conduction in Mo/Si multilayers

    NASA Astrophysics Data System (ADS)

    Medvedev, V. V.; Yang, J.; Schmidt, A. J.; Yakshin, A. E.; van de Kruijs, R. W. E.; Zoethout, E.; Bijkerk, F.

    2015-08-01

    This paper reports on the studies of anisotropic heat conduction phenomena in Mo/Si multilayers with individual layer thicknesses selected to be smaller than the mean free path of heat carriers. We applied the frequency-domain thermoreflectance technique to characterize the thermal conductivity tensor. While the mechanisms of the cross-plane heat conduction were studied in detail previously, here we focus on the in-plane heat conduction. To analyze the relative contribution of electron transport to the in-plane heat conduction, we applied sheet-resistance measurements. Results of Mo/Si multilayers with variable thickness of the Mo layers indicate that the net in-plane thermal conductivity depends on the microstructure of the Mo layers.

  9. MoSi2-Base Hybrid Composites from Aeroengine Applications

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    2000-01-01

    Addition of about 30 to 50 vol % of Si3N4 particulate to MoSi2 improved low temperature accelerated oxidation resistance by forming a Si2ON2 protective scale and thereby eliminated catastrophic 'pest failure'. The Si3N4 addition also improved the high temperature creep strength by nearly five orders of magnitude, doubled the room temperature toughness, and significantly lowered the CTE of the MoSi2 which eliminated matrix cracking in SCS-6 reinforced composites even after thermal cycling. The SCS-6 fiber reinforcement improved the room temperature fracture toughness by seven times and impact resistance by five times. The composite exhibited this excellent strength and toughness improvement up to 1673 K. More recently, tape casting was adopted as the preferred processing of MoSi2-base composites due to improved fiber spacing, ability to use small diameter fibers, and for lower cost. Good strength and toughness values were also obtained with fine diameter Hi-Nicalon tow fibers. These hybrid composites remain competitive with ceramic matrix composites as a replacement for Ni-base superalloys in aircraft engine applications.

  10. MoSi2-Base Structural Composite Passed Engine Test

    NASA Technical Reports Server (NTRS)

    Nathal, Michael V.; Hebsur, Mohan G.

    1999-01-01

    The intermetallic compound molybdenum disilicide (MoSi2) is an attractive high-temperature structural material for advanced engine applications. It has excellent oxidation resistance, a high melting point, relatively low density, and high thermal conductivity; and it is easily machined. Past research at the NASA Lewis Research Center has resulted in the development of a hybrid composite consisting of a MoSi2 matrix reinforced with silicon nitride (Si3N4) particulate and silicon carbide (SiC) fibers. This composite has demonstrated attractive strength, toughness, thermal fatigue, and oxidation resistance, including resistance to "pest" oxidation. These properties attracted the interest of the Office of Naval Research and Pratt & Whitney, and a joint NASA/Navy/Pratt & Whitney effort was developed to continue to mature the MoSi2 composite technology. A turbine blade outer air seal, which was part of the Integrated High Performance Turbine Engine Technology (IHPTET) program, was chosen as a first component on which to focus.

  11. Improved Reflectance and Stability of Mo/Si Multilayers

    SciTech Connect

    Bajt, S.; Almeda, J.; Naree, T.; Clift, M.; Folta, A.; Kauffman, B.; Spiller, E.

    2001-10-22

    Commercial EUV lithographic systems require multilayers with higher reflectance and better stability then that published to date. Interface-engineered Mo/Si multilayers with 70% reflectance at 13.5 nm wavelength (peak width of 0.545 nm) and 71% at 12.7 nm wavelength (peak width of 0.49 nm) were developed. These results were achieved with 50 bilayers. These new multilayers consist of Mo and Si layers separated by thin boron carbide layers. Depositing boron carbide on interfaces leads to reduction in silicide formation on the Mo-on-Si interfaces. Bilayer contraction is reduced by 30% implying that there is less intermixing of Mo and Si to form silicide. As a result the Mo-on-Si interfaces are sharper in interface-engineered multilayers than in standard Mo/Si multilayers. The optimum boron carbide thicknesses have been determined and appear to be different for Mo-on-Si and Si-on-Mo interfaces. The best results were obtained with 0.4 nm thick boron carbide layer on the Mo-on-Si interface and 0.25 nm thick boron carbide layer on the Si-on-Mo interface. Increase in reflectance is consistent with multilayers with sharper and smoother interfaces. A significant improvement in oxidation resistance of EUV multilayers has been achieved with ruthenium terminated Mo/Si multilayers. The best capping layer design consists of a Ru layer separated from the last Si layer by a boron carbide layer. This design achieves high reflectance and the best oxidation resistance in a water vapor (i.e. oxidation) environment. Electron beam exposures of 4.5 hours in the presence of 5x10{sup -7} torr water vapor partial pressure show no measurable reflectance loss and no increase in the oxide thickness of Ru terminated multilayers. Longer exposures in different environments are necessary to test lifetime stability of many years.

  12. MoSi2-Base Hybrid Composite Passed Engine Test

    NASA Technical Reports Server (NTRS)

    Keith, Theo G., Jr.; Hebsur, Mohan

    1998-01-01

    The intermetallics compound molybdenum disilicide (MoSi2) is an attractive high-temperature structural material for advanced engine applications. It has excellent oxidation resistance, a high melting point, relatively low density, and high thermal conductivity, and it is easily machined. Past research'at the NASA Lewis Research Center has resulted in the development of a hybrid composite consisting of a MoSi2 matrix reinforced with silicon nitride (Si3N4) Particulate and silicon carbide (SiC) fibers. This composite has demonstrated attractive strength, toughness, thermal fatigue, and oxidation resistance, including resistance to "pest" oxidation. These properties attracted the interest of the Office of Naval Research and Pratt & Whitney, and a joint NASA/Navy/Pratt & Whitney effort was developed to continue to mature the MoSi2 Composite technology. A turbine blade outer air seal, which was part of the Integrated High Performance Turbine Engine Technology (IHPTET) program, was chosen as a first component on which to focus. The first tasks of the materials development effort were to develop improved processing methods to reduce costs and to use fine-diameter fibers that enable the manufacturing of complex shapes. Tape-casting methods were developed to fully infiltrate the fine SiC fibers with matrix powders. The resulting composites were hot pressed to 100-percent density. Composites with cross-plied fiber architectures with 30 vol. % hi-nicalon SiC fibers and 30 vol. % nitride particles are now made routinely and demonstrate a good balance of properties. The next task entailed the measurement of a wide variety of mechanical properties to confirm the suitability of this composite in engines. In particular, participants in this effort demonstrated that composites made with Hi-Nicalon fibers had strength and toughness properties equal to or better than those of the composites made with the large-diameter fibers that had been used previously. Another critically

  13. Recovery of Mo/Si multilayer coated optical substrates

    DOEpatents

    Baker, S.L.; Vernon, S.P.; Stearns, D.G.

    1997-12-16

    Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.

  14. Recovery of Mo/Si multilayer coated optical substrates

    DOEpatents

    Baker, Sherry L.; Vernon, Stephen P.; Stearns, Daniel G.

    1997-12-16

    Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

  15. Characterization of Mo/Si multilayer growth on stepped topographies

    SciTech Connect

    Boogaard, A. J. R. vcan den; Louis, E.; Zoethout, E.; Goldberg, K. A.; Bijkerk, F.

    2011-08-31

    Mo/Si multilayer mirrors with nanoscale bilayer thicknesses have been deposited on stepped substrate topographies, using various deposition angles. The multilayer morphology at the stepedge region was studied by cross section transmission electron microscopy. A transition from a continuous- to columnar layer morphology is observed near the step-edge, as a function of the local angle of incidence of the deposition flux. Taking into account the corresponding kinetics and anisotropy in layer growth, a continuum model has been developed to give a detailed description of the height profiles of the individual continuous layers. Complementary optical characterization of the multilayer system using a microscope operating in the extreme ultraviolet wavelength range, revealed that the influence of the step-edge on the planar multilayer structure is restricted to a region within 300 nm from the step-edge.

  16. Aperiodic Mo/Si multilayers for hard x-rays.

    PubMed

    Pardini, Tom; Alameda, Jennifer; Platonov, Yuriy; Robinson, Jeff; Soufli, Regina; Spiller, Eberhard; Walton, Chris; Hau-Riege, Stefan P

    2016-08-01

    In this work we have developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) to reflect 16.25 keV photons at a grazing angle of incidence of 0.6° ± 0.05°. To the best of our knowledge this is the first time this material system has been used to fabricate aperiodic MLs for hard x-rays. At these energies new hurdles arise. First of all a large number of bilayers is required to reach saturation. This poses a challenge from the manufacturing point of view, as thickness control of each ML period becomes paramount. The latter is not well defined a priori, due to the thickness of the interfacial silicide layers which has been observed to vary as a function of Mo and Si thickness. Additionally an amorphous-to-crystalline transition for Mo must be avoided in order maintain reasonably low roughness at the interfaces. This transition is well within the range of thicknesses pertinent to this study. Despite these difficulties our data demonstrates that we achieved reasonably flat ML response across the angular acceptance of ± 0.05°, with an experimentally confirmed average reflectivity of 28%. Such a ML prescription is well suited for applications in the field of hard x-ray imaging of highly diverging sources. PMID:27505826

  17. Thermal conduction properties of Mo/Si multilayers for extreme ultraviolet optics

    NASA Astrophysics Data System (ADS)

    Bozorg-Grayeli, Elah; Li, Zijian; Asheghi, Mehdi; Delgado, Gil; Pokrovsky, Alexander; Panzer, Matthew; Wack, Daniel; Goodson, Kenneth E.

    2012-10-01

    Extreme ultraviolet (EUV) lithography requires nanostructured optical components, whose reliability can be influenced by radiation absorption and thermal conduction. Thermal conduction analysis is complicated by sub-continuum electron and phonon transport and the lack of thermal property data. This paper measures and interprets thermal property data, and their evolution due to heating exposure, for Mo/Si EUV mirrors with 6.9 nm period and Mo/Si thickness ratios of 0.4/0.6 and 0.6/0.4. We use time-domain thermoreflectance and the 3ω method to estimate the thermal resistance between the Ru capping layer and the Mo/Si multilayers (RRu-Mo/Si = 1.5 m2 K GW-1), as well as the out-of-plane thermal conductivity (kMo/Si 1.1 W m-1 K-1) and thermal anisotropy (η = 13). This work also reports the impact of annealing on thermal conduction in a co-deposited MoSi2 layer, increasing the thermal conductivity from 1.7 W m-1 K-1 in the amorphous phase to 2.8 W m-1 K-1 in the crystalline phase.

  18. Bending creep behavior of pressureless sintered MoSi{sub 2}

    SciTech Connect

    Dusza, J.; Hvizdos, P.; Steinkellner, W.; Kromp, K.

    1997-08-15

    Creep behavior in bending of the hot pressed MoSi{sub 2} was studied in the temperature and stress intervals from 1,100 C--1,200 C and from 20 to 100 MPa, respectively. In spite of the fact that the MoSi{sub 2} was not reinforced with a second particle/whisker phase the creep resistance of the material was comparably high because of the clean character of the MoSi{sub 2}/MoSi{sub 2} grain boundaries. The resulting data, the creep exponent from n = 1.3 to 2.4 and the apparent activation energy from Q = 159 to 634 kJ mol{sup {minus}1} are comparable with the data achieved in compressive creep tests for similar materials and together with TEM results they prove that the principal creep mechanism at 1,200 C is probably dislocation climbing. The bending creep test seems to be a good technique for the characterization of the high temperature mechanical properties of MoSi{sub 2} based materials, but similarly as in the case of structural ceramics it is limited to the low-deformation regimes.

  19. Thermoelectric properties of bulk MoSi2 synthesized by solid state microwave heating

    NASA Astrophysics Data System (ADS)

    Lan, Yu; Xie, Mianyu; Ouyang, Ting; Yue, Song

    2016-07-01

    In this research, single phase α-MoSi2 was prepared by solid state hybrid microwave heating within 90 min at relatively low temperature 1273 K. Such precursor powders were then ball milled and sintered by microwave heating at different temperatures. The thermoelectric (TE) properties of MoSi2 bulks were investigated in the temperature range of 300-673 K. When the sintering temperature increases from 973 K to 1273 K, the electrical resistivity decreases significantly and the Seebeck coefficients increase obviously, leading to the maximum TE powder factor of 6.2 × 10-6Wm-1K-2 at 673 K. These results demonstrate the feasibility of high efficient and economical synthesis of MoSi2 by microwave heating technique, with the final products having comparable TE performance in comparison to those from typical methods with long duration and energy-extensive consumption.

  20. Functionally graded MoSi2-Al2O3 tubes for temperature sensor application.

    SciTech Connect

    Peters, M. I.; Vaidya, R. U.; Castro, R. G.; Petrovic, J. J.; Hollis, K. J.; Gallegos, D. E.

    2001-01-01

    MoSi{sub 2} and Al{sub 2}O{sub 3} are thermodynamically stable elevated temperature materials whose thermal expansion coefficients match closely. Composites of these materials have potential for applications such as protective sheaths for high temperature sensors. MoSi{sub 2}-Al{sub 2}O{sub 3} functionally graded tubes were fabricated using advanced plasma spray-forming techniques. Both continuously-graded and layered-graded tube microstructures were synthesized. The characteristics of the graded microstructures and the features of the graded mechanical properties of these tubes will be discussed.

  1. Microstructure and Wear Resistance of Plasma-Sprayed Molybdenum Coating Reinforced by MoSi2 Particles

    NASA Astrophysics Data System (ADS)

    Yan, Jianhui; He, Zheyu; Wang, Yi; Qiu, Jingwen; Wang, Yueming

    2016-10-01

    Mo coatings with or without incorporated MoSi2 were fabricated by atmospheric plasma spraying, and their microstructure, microhardness, bond strength, and wear resistance were compared. Two kinds of spray powder, i.e., pure Mo and a blend of Mo and MoSi2, were sprayed onto low-carbon steel. Microstructural analysis of the MoSi2-Mo coating showed MoSi2 homogeneously distributed in a Mo matrix. Addition of MoSi2 particles increased the microhardness of the as-sprayed Mo coating. The adhesion strength of the Mo coating was better than that of the MoSi2-Mo coating. Wear test results showed that the wear rate and friction coefficient of the two coatings increased with increasing load, and the friction coefficient of the MoSi2-Mo coating was lower than that of the Mo coating. The MoSi2-Mo composite coating exhibited better wear resistance than the Mo coating. The wear failure mechanisms of the two coatings were local plastic deformation, delamination, oxidation, and adhesion wear.

  2. Microstructure and Wear Resistance of Plasma-Sprayed Molybdenum Coating Reinforced by MoSi2 Particles

    NASA Astrophysics Data System (ADS)

    Yan, Jianhui; He, Zheyu; Wang, Yi; Qiu, Jingwen; Wang, Yueming

    2016-08-01

    Mo coatings with or without incorporated MoSi2 were fabricated by atmospheric plasma spraying, and their microstructure, microhardness, bond strength, and wear resistance were compared. Two kinds of spray powder, i.e., pure Mo and a blend of Mo and MoSi2, were sprayed onto low-carbon steel. Microstructural analysis of the MoSi2-Mo coating showed MoSi2 homogeneously distributed in a Mo matrix. Addition of MoSi2 particles increased the microhardness of the as-sprayed Mo coating. The adhesion strength of the Mo coating was better than that of the MoSi2-Mo coating. Wear test results showed that the wear rate and friction coefficient of the two coatings increased with increasing load, and the friction coefficient of the MoSi2-Mo coating was lower than that of the Mo coating. The MoSi2-Mo composite coating exhibited better wear resistance than the Mo coating. The wear failure mechanisms of the two coatings were local plastic deformation, delamination, oxidation, and adhesion wear.

  3. Evaluation of Mo-SiO{sub 2} continuous FGM`s. Final report

    SciTech Connect

    Tomsia, A.P.; Cannon, R.M.; McNaney, J.M.; Ishibashi, H.; Saiz, E.; MoberlyChan, W.; Becker, T.J.; Ritchie, R.O.

    1997-09-01

    The TOTO sponsored program at LBL involved characterization of continuous Mo-SiO{sub 2} FGMs in terms of microstructure, mechanical and thermal properties and corrosion resistance which would relate to the steady state, high temperature performance as well as the heating and cooling transients that occur at the beginning and end of operation in various applications.

  4. Novel high damage-tolerant, wear resistant MoSi2-based nanocomposite coatings

    NASA Astrophysics Data System (ADS)

    Xu, Jiang; Li, Zhengyang; Xie, Zong-Han; Munroe, Paul; Lu, Xiao Lin; Lan, Xiu Feng

    2013-04-01

    In this study, novel MoSi2-based nanocomposite coatings were deposited on Ti-6Al-4V substrates by a two-step process involving firstly, deposition of MoSi2-based coatings, using a double cathode glow discharge process and, secondly, plasma nitridation of the as-deposited coatings. The aim of this latter step is to introduce nitrogen into the coating and promote the formation of amorphous silicon nitride. The resulting coatings were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscope (XPS), transmission electron microscopy (TEM) and scanning electron microscopy (SEM). It was found that the nanocomposite coatings were composed of nanocrystallite Mo5Si3 and MoSi2 grains embedded in an amorphous Si3N4 matrix. The mechanical properties and damage resistance of the coatings were evaluated by both Vickers indentation and nanoindentation techniques. Dry sliding wear tests were performed using a ball-on-disc type tribometer, in which the coated samples were tested against a ZrO2 ceramic ball at normal loads of 2.8 and 4.3 N under ambient conditions. Compared with the monolithic MoSi2 nanocrystalline coating, the specific wear rates of the nanocomposite coatings decreased by an order of magnitude. The specific wear rate was further improved by about 20% through the addition of Al, which was attributed to an optimum combination of mechanical properties.

  5. Characterization of electrical resistivity as a function of temperature in the Mo-Si-B system

    SciTech Connect

    Beckman, Sarah E.

    1999-12-10

    Measurements of electrical resistivity as a function of temperature from 25 to 1,500 C were conducted on polycrystalline samples in the Mo-Si-B system. Single phase, or nearly single phase, samples were prepared for the following phases: Mo{sub 3}Si, Mo{sub 5}SiB{sub 2}, Mo{sub 5}Si{sub 3}B{sub x}, MoB, MoSi{sub 2}, and Mo{sub 5}Si{sub 3}. Thesis materials all exhibit resistivity values within a narrow range(4--22 x 10{sup {minus}7}{Omega}-m), and the low magnitude suggests these materials are semi-metals or low density of states metals. With the exception of MoSi{sub 2}, all single phase materials in this study were also found to have low temperature coefficient of resistivity(TCR) values. These values ranged from 2.10 x 10{sup {minus}10} to 4.74 x 10{sup {minus}10}{Omega}-m/{degree} C, and MoSi{sub 2} had a TCR of 13.77 x 10{sup {minus}10}{Omega}-m/{degree} C. The results from the single phase sample measurements were employed in a natural log rule-of-mixtures model to relate the individual phase resistivity values to those of multiphase composites. Three Mo-Si-B phase regions were analyzed: the binary Mo{sub 5}Si{sub 3}-MoSi{sub 2} system, the ternary phase field Mo{sub 5}Si{sub 3}B{sub x}MoB-MoSi{sub 2}, and the Mo{sub 3}Si-Mo{sub 5}SiB{sub 2}-Mo{sub 5} Si{sub 3}B{sub x} ternary region. The experimental data for samples in each of these regions agreed with the natural log model and illustrated that this model can predict the electrical resistivity as a function of temperature of multi-phase, sintered samples within an error of one standard deviation.

  6. Mechanically Activated Combustion Synthesis of MoSi2-Based Composites

    SciTech Connect

    Shafirovich, Evgeny

    2015-09-30

    The thermal efficiency of gas-turbine power plants could be dramatically increased by the development of new structural materials based on molybdenum silicides and borosilicides, which can operate at temperatures higher than 1300 °C with no need for cooling. A major challenge, however, is to simultaneously achieve high oxidation resistance and acceptable mechanical properties at high temperatures. One approach is based on the fabrication of MoSi2-Mo5Si3 composites that combine high oxidation resistance of MoSi2 and good mechanical properties of Mo5Si3. Another approach involves the addition of boron to Mo-rich silicides for improving their oxidation resistance through the formation of a borosilicate surface layer. In particular, materials based on Mo5SiB2 phase are promising materials that offer favorable combinations of high temperature mechanical properties and oxidation resistance. However, the synthesis of Mo-Si-B multi-phase alloys is difficult because of their extremely high melting temperatures. Mechanical alloying has been considered as a promising method, but it requires long milling times, leading to large energy consumption and contamination of the product by grinding media. In the reported work, MoSi2-Mo5Si3 composites and several materials based on Mo5SiB2 phase have been obtained by mechanically activated self-propagating high-temperature synthesis (MASHS). Short-term milling of Mo/Si mixture in a planetary mill has enabled a self-sustained propagation of the combustion front over the mixture pellet, leading to the formation of MoSi2-T1 composites. Combustion of Mo/Si/B mixtures for the formation of T2 phase becomes possible if the composition is designed for the addition of more exothermic reactions leading to the formation of MoB, TiC, or TiB2. Upon ignition, Mo/Si/B and Mo/Si/B/Ti mixtures exhibited spin combustion, but the products were porous, contained undesired secondary phases, and had low oxidation resistance. It has been shown that use of

  7. Application of EB repair for high durable MoSi PSM

    NASA Astrophysics Data System (ADS)

    Kanamitsu, Shingo; Morishita, Keiko; Hirano, Takashi

    2014-07-01

    Recently there has been a demand for high durability MoSi masks. There are some candidates for MoSi mask materials. They are preferable for both mask user and mask manufacture because they show not only high durability against exposure or cleaning process but also process compatibility in production line[1]. They are gaining momentum to practical application. However, there is a drawback for manufacturing regarding the mask repair process. Because ebeam repair employs pure chemical reaction, it faces severe etching difficulty due to higher chemical stability. Meanwhile, the tool supplier has looked into that chemical reaction in detail since the problem was unveiled. They developed a dedicated etching process for high durable materials. It's so important for the mask manufacturer to evaluate this process properly before they transfer conventional MoSi to new high durability MoSi. A comprehensive understanding of this new process should be acquired by trying several kinds of etching tests. In this paper we will report the results ranging from basic etching rate, selectivity, repair accuracy to flexibility for complicated shaped defects. This data tells us a lot about if it can be applied for practical use. The experiment was performed with e-beam repair tool "MeRiTⓇ", which was released as the latest version from ZEISS last year. An improved new etching process was applied to "A6L2" type high durable blanks provided by HOYA corporation. A wide variety of programmed defects were arranged on a line and space featured test mask. These programmed defects were repaired with the procedure developed by ZEISS. After repair, printed image was evaluated by AIMSTM system. This paper will discuss the initial results of these first steps into the uncharted territory of high durability MoSi repair.

  8. Investigation on the Electrical Properties of Vacuum Cold Sprayed SiC-MoSi2 Coatings at Elevated Temperatures

    NASA Astrophysics Data System (ADS)

    Wang, Y.-Y.; Liu, Y.; Li, C.-J.; Yang, G.-J.; Feng, J.-J.; Kusumoto, K.

    2011-06-01

    SiC-MoSi2 composite powders was prepared by wet milling with MoSi2 powders and SiC loose grinding ball in alcohol solution. Vacuum cold spray (VCS) process was used to deposit SiC-MoSi2 electric conducting composite coatings. The microstructure of the VCS SiC-MoSi2 composite coatings were characterized by scanning electron microscopy. The electrical resistance of the coatings was measured using a four-point probe method. The effects of the deposition parameters on the electrical resistivity of the composite coatings were investigated. The electrical properties of the coatings at elevated temperatures in air and Ar gas atmospheres were also explored. The results show that the electrical resistivity of SiC-MoSi2 coatings decreases with increasing He gas flow rates ranged from 3 to 6 L/min. The electrical resistivity increases with the increase in heat treatment temperature due to "pesting" behavior of MoSi2. The electric conductive property of the VCS SiC-MoSi2 coating is significantly improved after heat treatment at 1000 °C for 3 h in Ar protective atmosphere without oxidation. A minimum resistivity of the heat treated coating is 0.16 Ω · cm.

  9. Reticle blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers

    SciTech Connect

    Vernon, S.P.; Kania, D.R.; Kearney, P.A.; Levesque, R.A.; Hayes, A.V.; Druz, B.; Osten, E.; Rajan, R.; Hedge, H.

    1996-06-24

    We report on growth of low defect density Mo/Si multilayer (ML) coatings. The coatings were grown in a deposition system designed for EUVL reticle blank fabrication. Complete, 81 layer, high reflectance Mo/Si ML coatings were deposited on 150 mm dia (100) oriented Si wafer substrates using ion beam sputter deposition. Added defects, measured by optical scattering, correspond to defect densities of 2x10{sup -2}/cm{sup 2}. This represents a reduction in defect density of Mo/Si ML coatings by a factor of 10{sup 5}.

  10. Oxidation Behavior and Chlorination Treatment to Improve Oxidation Resistance of Nb-Mo-Si-B Alloys

    SciTech Connect

    Behrani, Vikas

    2004-01-01

    This thesis is written in an alternate format. The thesis is composed of a general introduction, two original manuscripts, and a general conclusion. References cited within each chapter are given at the end of each chapter. The general introduction starts with the driving force behind this research, and gives an overview of previous work on boron doped molybdenum silicides, Nb/Nb5Si3 composites, boron modified niobium silicides and molybdenum niobium silicides. Chapter 2 focuses on the oxidation behavior of Nb-Mo-Si-B alloys. Chapter 3 contains studies on a novel chlorination technique to improve the oxidation resistance of Nb-Mo-Si-B alloys. Chapter 4 summarizes the important results in this study.

  11. Phase field simulation of a directional solidification of a ternary eutectic Mo-Si-B Alloy

    NASA Astrophysics Data System (ADS)

    Kazemi, O.; Hasemann, G.; Krüger, M.; Halle, T.

    2016-03-01

    We present a eutectic Phase-Field Model for a Mo-Si-B alloy at ternary eutectic composition (Mo-17.5Si-8B), under a constant thermal gradient. The process parameters like cooling rate and thermal gradient were obtained directly from the experimental procedure of zone melting. The equilibrium interface geometries and interface mobility were calculated using an isotropic model. The phase equilibria and the other thermodynamic parameters are obtained by linearizing the Mo-Si-B ternary phase diagram. We have investigated the effect of process parameters on the lamellar growth pattern and lamella pattern stability with respect to the Jackson-Hunt minimum undercooling spacing theory. In order to examine the generated results by the model, they were validated with experimental observed microstructures and measurements and showed to be in a good agreement with the experimental observations.

  12. Combustion synthesis of MoSi{sub 2} - SiC oxidation resistant coatings

    SciTech Connect

    Monroe, K.A.; Govindarajan, S.; Moore, J.J.

    1994-12-31

    Several high-temperature, oxidation resistant materials were investigated as possible coatings for molybdenum furnace elements. Molybdenum disilicide (MoSi{sub 2}) composites are potential candidates for these high temperature coating applications. Composite materials were selected based on several factors, including oxidation resistance, coefficients of thermal expansion, compatibility at the coating/substrate interface, thermodynamic stability over a large temperature range and adhesion. The synthesis of dense MoSi{sub 2}-SiC composites through simultaneous combustion and hot-pressing is currently being investigated. Functionally graded materials (FGM`s) are being studied to overcome some of the property differences between a coating and a substrate. Oxidation testing was used to determine the protective qualities of the FGM`s.

  13. Chlorination treatment to improve the oxidation resistance of Nb-Mo-Si-B alloys

    NASA Astrophysics Data System (ADS)

    Behrani, Vikas; Thom, Andrew J.; Kramer, Matthew J.; Akinc, Mufit

    2005-03-01

    Recent studies have shown that the quaternary Nb-Mo-Si-B system is not oxidation resistant. The difference in oxidation resistance between Mo-Si-B and Nb-Mo-Si-B may be interpreted in terms of the volatility of the metal oxide that forms. MoO3 evaporates from the surface scale at about 650 °C, leaving a porous borosilicate glassy scale. Nb2O5 persists as a rapidly growing condensed phase that overwhelms the ability of the borosilicate glass to form a protective layer. In the present work, a novel chlorination process was employed to selectively remove Nb2O5 from the scale of the quaternary alloy as volatile NbCl5. A Nb-Mo-Si-B alloy was studied with a nominal composition of 63(Nb,Mo)-30Si-7B (at. pct) with Nb/Mo = 1:1. The alloy consisted of a three-phase microstructure of (Nb,Mo)5Si3B x (T1)-(Nb,Mo)5(Si,B)3 (T2)-(Nb,Mo)5Si3B x (D88). The oxidation behavior of these alloys in air was studied both before and after chlorination. Results showed that Nb2O5 can be selectively removed from the scale to leave a borosilicate-rich scale, which then forms a dense scale after heat treatment at 1100 °C in argon. The oxidation rate of the chlorinated alloy was about one-third that of the unchlorinated alloy under identical conditions. Alloy oxidation during heating to the test temperature was studied, and a plausible mechanism for the formation of porosity in the oxide scale has been offered.

  14. Electrolytical production of Ni + Mo + Si composite coatings with enhanced content of Si

    NASA Astrophysics Data System (ADS)

    Kubisztal, J.; Budniok, A.

    2006-10-01

    Ni + Mo + Si composite coatings were prepared by co-deposition of nickel with molybdenum and silicon powders from a nickel solution in which Mo and Si particles were suspended by stirring. The layers have been deposited on a carbon steel substrate (St3S) under galvanostatic conditions. The content of Si in deposited layers was about 2-5 wt.% depending on deposition current density and the value of electric charge. For comparison Ni + Mo composite coatings were obtained under analogous current conditions. Composite coatings of enhanced Si content (15 wt.%) were deposited from an electrolyte in which 40 g/dm 3 of Si covered with electroless plated nickel was dispersed. Deposition current density was equal 0.1 A/cm 2 and the value of electric charge Q = 500 C/cm 2. The thickness of the coatings was about 100-300 μm depending on their kind, electric charge and the deposition current density. Surface and cross-section morphology were investigated by scanning electron microscope (SEM). All deposited coatings are characterized by great, developed surface area. No internal stresses causing their cracking were observed. Chemical composition of the layers was determined by X-ray fluorescence spectroscopy (XRF) method and quantitative X-ray analysis (QXRD). It was stated, that the content of molybdenum and silicon in Ni + Mo + Si coatings depends on deposition current density and the amount of the powder in bath. The results of structural investigation of the obtained layers by the X-ray diffraction (XRD) method show, that they consist in crystalline Mo or Mo and Si phases built into Ni matrix. Moreover, Ni + Mo + Si composite coatings were modified by thermal treatment. It has been found that the thermal treatment of Ni + Mo + Si composite coatings caused that the new phases (NiSi, Mo 2Ni 3Si and Ni 6Mo 6C 1.06) were obtained.

  15. MoSi 2 Oxidation in 670-1498 K Water Vapor

    DOE PAGES

    Sooby Wood, Elizabeth; Parker, Stephen S.; Nelson, Andrew T.; Maloy, Stuart A.; Butt, D.

    2016-03-08

    Molybdenum disilicide (MoSi2) has well documented oxidation resistance at high temperature (T > 1273 K) in dry O2 containing atmospheres due to the formation of a passive SiO2 surface layer. But, its behavior under atmospheres where water vapor is the dominant species has received far less attention. Oxidation testing of MoSi2 was performed at temperatures ranging from 670–1498 K in both 75% water vapor and synthetic air (Ar-O2, 80%–20%) containing atmospheres. Here the thermogravimetric and microscopy data describing these phenomena are presented. Over the temperature range investigated, MoSi2 displays more mass gain in water vapor than in air. The oxidationmore » kinetics observed in water vapor differ from that of the air samples. Two volatile oxides, MoO2(OH)2 and Si(OH)4, are thought to be the species responsible for the varied kinetics, at 670–877 K and at 1498 K, respectively. Finally, we observed an increase in oxidation (140–300 mg/cm2) from 980–1084 K in water vapor, where passivation is observed in air.« less

  16. A comparative study of the abrasive wear behavior of MoSi[sub 2

    SciTech Connect

    Hawk, J.A.; Alman, D.E. . Albany Research Center)

    1995-03-01

    This study is a preliminary assessment of the abrasive wear behavior of monolithic MoSi[sub 2]. Comparisons with the wear behavior of other advanced materials, such as refractory metals, intermetallic compounds (i.e., TiAl, Fe[sub 3]Al), and ceramics (i.e., Si[sub 3]N[sub 4], ZrO[sub 2], and Al[sub 2]O[sub 3]), are made. In general, the wear behavior of MoSi[sub 2] is similar to oxide ceramics, due in large part to the high relative hardness of the compound. However, as with most brittle materials, as the hardness of the abrasive increases relative to the hardness of the wearing material (i.e., MoSi[sub 2] abraded on garnet at 13 GPa versus abrasion on SiC at 24 GPa), volume wear increases; and the dominant wear mechanism changes, from one of primarily edge fracture to one combining micro-cutting with significant micro-fracture and grain pull-out.

  17. FeAl and Mo-Si-B Intermetallic Coatings Prepared by Thermal Spraying

    SciTech Connect

    Totemeier, T.C.; Wright, R.N.; Swank, W.D.

    2003-04-22

    FeAl and Mo-Si-B intermetallic coatings for elevated temperature environmental resistance were prepared using high-velocity oxy-fuel (HVOF) and air plasma spray (APS) techniques. For both coating types, the effect of coating parameters (spray particle velocity and temperature) on the microstructure and physical properties of the coatings was assessed. Fe-24Al (wt.%) coatings were prepared using HVOF thermal spraying at spray particle velocities varying from 540 m/s to 700 m/s. Mo-13.4Si-2.6B coatings were prepared using APS at particle velocities of 180 and 350 m/s. Residual stresses in the HVOF FeAl coatings were compressive, while stresses in the APS Mo-Si-B coatings were tensile. In both cases, residual stresses became more compressive with increasing spray particle velocity due to increased peening imparted by the spray particles. The hardness and elastic moduli of FeAl coatings also increased with increasing particle velocity, again due to an increased peening effect. For Mo-Si-B coatings, plasma spraying at 180 m/s resulted in significant oxidation of the spray particles and conversion of the T1 phase into amorphous silica and {alpha}-Mo. The T1 phase was retained after spraying at 350 m/s.

  18. Characterization of structure and mechanical properties of MoSi{sub 2}-SiC nanolayer composites

    SciTech Connect

    Kung, H.; Jervis, T.R.; Nastasi, M.; Mitchell, T.E.; Hirvonen, J.P.

    1993-12-31

    A systematic study of structure-mechanical properties relation is reported for MoSi{sub 2}-SiC nanolayer composites. Alternating layers of MoSi{sub 2} and SiC were synthesized by DC magnetron and rf-diode sputtering, respectively. Cross-sectional transmission electron microscopy was used to examine three distinct reactions in the specimens when exposed to different annealing conditions: Crystallization and phase transformation of MoSi{sub 2}, crystallization of SiC, and spheroidization of the layer structures. Nanoindentation was employed to characterize the mechanical response as a function of structural changes. As-sputtered material exhibits amorphous structures in both types of layers and has a hardness of 11 GPa and a modulus of 217GPa. Subsequent heat treatment induces crystallization of MoSi{sub 2} to form the C40 structure at 500C and SiC to form the a structure at 700C. The crystallization process is directly responsible for hardness and modulus increase in multilayers. A hardness of 24GPa and a modulus of 340GPa can be achieved through crystallizing both MoSi{sub 2} and SiC layers. Annealing at 900C for 2h causes the transformation of MoSi{sub 2} into the C11{sub b} structure, as well as spheroidization of the layering to form a nanocrystaulline equiaxed microstructure. A slight degradation in hardness but not in modulus is observed accompanying the layer break-down.

  19. Processing of Mo-Si-B intermetallics by extrusion and oxidation properties of the extruded Tl-MoSi{sub 2}-MoB System

    SciTech Connect

    Summers, Eric

    1999-11-08

    An extrusion process was developed that is able to consistently produce large quantities of Mo-Si-B rods without the presence of defects. Binder removal from the extruded rods was studied in detail and it was determined that heating rates on the order of 0.02{degree}/minute (1.2{degree}/hour) are necessary to remove the binder without the formation of defects. This low heating rate resulted in debinding times in excess of 70 hours (approximately 3 days). Wicking was investigated as a means to decrease the time necessary for binder removal. Using 0.05{micro}m alumina powder as a wicking agent, binder removal times were reduced to 10 hours with heating rates up to 1{degree}/minute employed without defect formation. Once the extrusion process was complete the oxidation properties of the Tl-MoSi{sub 2}-MoB extruded phase assemblage was investigated. It was determined that this composition exhibits catastrophic oxidation or pesting in the temperature range of 660--760 C, resulting in the material turning to dust. Outside of this temperature range the composition is oxidatively stable. Continuous mass measurements were taken at 1,300, 1,450, and 1,600 C to determine the oxidation rate constants of this material. Parabolic rate constants of 6.9 x 10{sup {minus}3}, 1.3 x 10{sup {minus}3}, and 9.1 x 10{sup {minus}3} mg{sup 2}/cm{sup 4}/hr were determined for 1,300, 1,450, and 1,600 C respectively.

  20. Novel Processing of mo-si-b Intermetallics for improved efficiency of power systems

    SciTech Connect

    M.J. Kramer; O. Degirmen; A.J. Thom; M. Akinc

    2004-09-30

    Multiphase composite alloys based on the Mo-Si-B system are candidate materials for ultra-high temperature applications. In non load-bearing applications such as thermal barrier coatings or heat exchangers in fossil fuel burners, these materials may be ideally suited. Alloys based on the Mo{sub 5}Si{sub 3}B{sub x} phase (Tl phase) possess excellent oxidation resistance to at least 1600 C in synthetic air atmospheres. However, the ability of Tl-based alloys to resist aggressive combustion environments has not yet been determined. The present work seeks to investigate the resistance of these Mo-Si-B alloys to simulated combustion atmospheres. Material was pre-alloyed by combustion synthesis, and samples for testing were prepared by classic powder metallurgical processing techniques. Precursor material synthesized by self-heating-synthesis was sintered to densities exceeding 98% in an argon atmosphere at 1800 C. The approximate phase assemblage of the material was 57% Tl, 29% MoB, 14% MoSi{sub 2} (wt%). The alloy was oxidized from 1000-1100 C in flowing air containing water vapor at 18 Torr. At 1000 C the material achieved a steady state mass loss, and at 1100 C the material undergoes a steady state mass gain. The oxidation rate of these alloys in this temperature regime was accelerated by the presence of water vapor compared to oxidation in dry air. The results of microstructural analysis of the tested alloys will be discussed. Techniques and preliminary results for fabricating near-net-shaped parts will also be presented.

  1. Near-Eutectic Ternary Mo-Si-B Alloys: Microstructures and Creep Properties

    NASA Astrophysics Data System (ADS)

    Hasemann, G.; Kaplunenko, D.; Bogomol, I.; Krüger, M.

    2016-08-01

    In the present work, the microstructural evolution during the solidification of different near-eutectic Mo-Si-B alloys was investigated. The alloy compositions were chosen from the vicinity of the eutectic region with respect to published liquidus projections. The aim was to identify a eutectic alloy composition in the Mo-rich region of the system, which would be suitable for directional solidification (DS). In a second step, two alloy compositions were prepared via DS and first creep results of these near-eutectic DS alloys are presented and discussed.

  2. Effect of Cu, Mo, Si on the content of retained austenite of austempered ductile iron

    SciTech Connect

    Mi, Y.

    1995-05-01

    In this paper, the effects of Cu, Mo, Si contents on the volume fraction of retained austenite of austempered ductile iron (ADI) are analyzed exactly by X-ray diffraction, and the fracture modes of test samples with different volume fraction of retained austenite are investigated by SEM. It is shown that the retained austenite content increases with the content of copper, decreases with the content of molybdenum, and reaches the maximum with a certain content of silicon. When the retained austenite content decreases, the fracture modes of test samples change from ductile fracture to cleavage fracture.

  3. Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer

    NASA Astrophysics Data System (ADS)

    Le, Zi-chun; L, Dreeskornfeld; S, Rahn; R, Segler; U, Kleineberg; U, Heinzmann

    1999-09-01

    Mo/Si multilayer mirrors (30 periods, doublelayer thickness 7 nm) with the AZ-PF514 resist pattern whose smallest lines and spaces structure was 0.5 μm were etched by reactive ion etching (RIE) in a fluorinated plasma. The etch rate, selectivity and etch profile were investigated as a function of the gas mixture, pressure, and plasma rf power. The groove depth and the etch profile were investigated by an atomic force microscope before RIE, after RIE and after resist removal.

  4. Composition and resistivity changes of reactively sputtered W-Si-N thin films under vacuum annealing

    SciTech Connect

    Vomiero, A.; Boscolo Marchi, E.; Mariotto, G.; Quaranta, A.; Della Mea, G.; Ottaviani, G.; Tonini, R.; Butturi, M.; Martinelli, G.

    2006-01-16

    W-Si-N layers about 200 nm thick with different nitrogen content were reactively sputtered from a W{sub 5}Si{sub 3} target on oxidized silicon substrates. The thermal stability of the films' composition and resistivity was studied with ion beam analysis and four-point probe measurements. Upon vacuum annealing from 600 to 980 deg. C for 1.5 h, a sample with an initial 56 at. % of nitrogen gradually loses nitrogen down to 36%. This composition lies close to the W-Si{sub 3}N{sub 4} tie line. Concurrently, the room temperature resistivity decreases from 4.7 to about 2 m{omega} cm. The composition changes only a little for a sample whose initial composition is near the W-Si{sub 3}N{sub 4} tie line and the resistivity changes significantly less than for the nitrogen-rich film. Interpretations are discussed.

  5. Mo-Si-B alloys for ultrahigh-temperature structural applications.

    PubMed

    Lemberg, J A; Ritchie, R O

    2012-07-10

    A continuing quest in science is the development of materials capable of operating structurally at ever-increasing temperatures. Indeed, the development of gas-turbine engines for aircraft/aerospace, which has had a seminal impact on our ability to travel, has been controlled by the availability of materials capable of withstanding the higher-temperature hostile environments encountered in these engines. Nickel-base superalloys, particularly as single crystals, represent a crowning achievement here as they can operate in the combustors at ~1100 °C, with hot spots of ~1200 °C. As this represents ~90% of their melting temperature, if higher-temperature engines are ever to be a reality, alternative materials must be utilized. One such class of materials is Mo-Si-B alloys; they have higher density but could operate several hundred degrees hotter. Here we describe the processing and structure versus mechanical properties of Mo-Si-B alloys and further document ways to optimize their nano/microstructures to achieve an appropriate balance of properties to realistically compete with Ni-alloys for elevated-temperature structural applications.

  6. Mechanical characterization of SiC whisker-reinforced MoSi/sub 2/

    SciTech Connect

    Carter, D.H.; Gibbs, W.S.; Petrovic, J.J.

    1988-01-01

    The mechanical characteristics of an intermetallic matrix with two different reinforcements were studied. The matrix material was MoSi/sub 2/, with either Los Alamos VLS SiC whiskers or Huber VS SiC whiskers. The purpose of the reinforcement was to provide toughening at ambient temperature and strengthening at elevated temperatures. The VLS whiskers greatly improved the yield strength of the matrix at 1200/degree/C, and also increased the room temperature fracture toughness of the matrix. The VS whiskers were added because they are much smaller in length and diameter, and therefore decreased the mean free path between whiskers, at the same volume fraction. The VS whiskers improved the toughness of the matrix at ambient temperature, and increased the yield strength of MoSi/sub 2/ at 1400/degree/C by 470%. The high strength of this new composite places this material in the realm of attractive engineering materials for high-temperature applications. 11 refs., 6 refs., 1 tab.

  7. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography

    SciTech Connect

    Bajt, S; Clift, W M; Folta, J A; Gullikson, E M; Klebanoff, L E; Kleineberg, U; Malinowski, M E; Wedowski, M

    1999-08-05

    Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination

  8. Mo-Si-B alloys for ultrahigh-temperature structural applications.

    PubMed

    Lemberg, J A; Ritchie, R O

    2012-07-10

    A continuing quest in science is the development of materials capable of operating structurally at ever-increasing temperatures. Indeed, the development of gas-turbine engines for aircraft/aerospace, which has had a seminal impact on our ability to travel, has been controlled by the availability of materials capable of withstanding the higher-temperature hostile environments encountered in these engines. Nickel-base superalloys, particularly as single crystals, represent a crowning achievement here as they can operate in the combustors at ~1100 °C, with hot spots of ~1200 °C. As this represents ~90% of their melting temperature, if higher-temperature engines are ever to be a reality, alternative materials must be utilized. One such class of materials is Mo-Si-B alloys; they have higher density but could operate several hundred degrees hotter. Here we describe the processing and structure versus mechanical properties of Mo-Si-B alloys and further document ways to optimize their nano/microstructures to achieve an appropriate balance of properties to realistically compete with Ni-alloys for elevated-temperature structural applications. PMID:22711489

  9. Development of a Mo-Si-B coating for Nb-based Alloys and the Effects of Zr Additions to Mo-Si-B Coatings for Enhanced Oxidation Protection in Ultra-High Temperature Applications

    NASA Astrophysics Data System (ADS)

    Lu-Steffes, Otto John

    Higher efficiencies and reduced emissions performance of fossil fuel energy systems are achieved with increasing operation temperatures. This increase in operating temperature requires the use of materials with higher melting points such as refractory metal alloys. However, refractory metals suffer from catastrophic oxidation in this type of environment. Thus, oxidation protection for refractory metal alloys is a crucial step in developing next generation ultra-high temperature materials. To meet this challenge, an oxidation resistant coating for Nb based alloys has been designed as well as the incorporation of zirconium into the Mo-Si-B coating to provide further corrosion protection and a reduction in temperature for the underlying multi-layered structure. Niobium samples coated with a Mo-Si-B coating demonstrate enhanced oxidation protection compared to samples only coated with Si-B. Thermogravimetric analysis testing at 1300°C for 24 hours for both the Mo-Si-B coated Nb and Nb-based alloys show enhanced oxidation protection with mass changes of 0.44 mg/cm2 and 0.55 mg/cm2, respectively, compared to the uncoated alloy that had a mass change of 87.6 mg/cm2. To demonstrate the design concept for a coating with thermal barrier behavior, Zr is added to the Mo-Si-B coating through the pack cementation technique. The resulting coating shows that the Zr reacts with the aluminosilica top layer to form Zr silicides and ZrO2. Upon oxidation, the coating forms a mixed top layer composed of borosilica, ZrO2 and ZrSiO 4. Oxidation testing of the Zr modified Mo-Si-B coating exhibits low mass change indicating that the coating provides oxidation protection and that the Zr additions do not interfere with the oxidation protection of the Mo-Si-B coating. Finite element modeling using object oriented finite element analysis of the coating structures yielded an evaluation of the mechanical and thermal properties of the coatings, providing insight into the thermal performance and

  10. High-efficiency superconducting nanowire single-photon detectors fabricated from MoSi thin-films.

    PubMed

    Verma, V B; Korzh, B; Bussières, F; Horansky, R D; Dyer, S D; Lita, A E; Vayshenker, I; Marsili, F; Shaw, M D; Zbinden, H; Mirin, R P; Nam, S W

    2015-12-28

    We report on MoSi SNSPDs which achieved high system detection efficiency (87.1 ± 0.5% at 1542 nm) at 0.7 K and we demonstrate that these detectors can also be operated with saturated internal efficiency at a temperature of 2.3 K in a Gifford-McMahon cryocooler. We measured a minimum system jitter of 76 ps, maximum count rate approaching 10 MHz, and polarization dependence as low as 3.3 ± 0.1%. The performance of MoSi SNSPDs at 2.3 K is similar to the performance of WSi SNSPDs at < 1 K. The higher operating temperature of MoSi SNSPDs makes these devices promising for widespread use due to the simpler and less expensive cryogenics required for their operation.

  11. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, J.G.; Roherty-Osmun, E.L.; Smith, P.M.; Custer, J.S.; Jones, R.V.; Nicolet, M.; Madar, R.; Bernard, C.

    1999-06-29

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF[sub 6], either silicon or boron, and nitrogen. The result is a W-Si-N or W-B-N thin film useful for diffusion barrier and micromachining applications. 10 figs.

  12. Chemical vapor deposition of W-Si-N and W-B-N

    DOEpatents

    Fleming, James G.; Roherty-Osmun, Elizabeth Lynn; Smith, Paul M.; Custer, Jonathan S.; Jones, Ronald V.; Nicolet, Marc-A.; Madar, Roland; Bernard, Claude

    1999-01-01

    A method of depositing a ternary, refractory based thin film on a substrate by chemical vapor deposition employing precursor sources of tungsten comprising WF.sub.6, either silicon or boron, and nitrogen. The result is a W--Si--N or W--B--N thin film useful for diffusion barrier and micromachining applications.

  13. The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

    SciTech Connect

    Pershyn, Yuriy; Gullikson, Erik; Artyukov, Igor; Kondratenko, Valeriy; Sevryukova, Victoriya; Voronov, Dmitriy; Zubarev, Evgeniy; Vinogradov, Alexander

    2011-08-08

    Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering ({lambda} = 0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.

  14. Functionally graded MoSi[sub 2]-Al[sub2]O[sub 3] tubes for temperature sensor application

    SciTech Connect

    Peters, M. I.; Vaidya, R. U.; Castro, R. G.; Petrovic, J. J.; Hollis, K. J.; Gallegos, D. E.

    2001-01-01

    MoSi{sub 2} and Al{sub 2}O{sub 3} are thermodynamically stable elevated temperature materials whose thermal expansion coefficients match closely. Composites of these materials have potential for applications such as protective sheaths for high temperature sensors. MoSi{sub 2}-Al{sub 2}O{sub 3} functionally graded tubes were fabricated using advanced plasma spray-forming techniques. Both continuously-graded and layered-graded tube microstructures were synthesized. The characteristics of the graded microstructures and the features of the graded mechanical properties of these tubes will be discussed.

  15. Oxidation Behavior of Mo-Si-B Alloys in Wet Air

    SciTech Connect

    M. Kramer; A. Thom; O. Degirmen; V. Behrani; M. Akinc

    2002-04-22

    Multiphase composite alloys based on the Mo-Si-B system are candidate materials for ultra-high temperature applications. In non load-bearing uses such as thermal barrier coatings or heat exchangers in fossil fuel burners, these materials may be ideally suited. The present work investigated the effect of water vapor on the oxidation behavior of Mo-Si-B phase assemblages. Three alloys were studied: Alloy 1 = Mo{sub 5}Si{sub 3}B{sub x} (T1)- MoSi{sub 2}- MoB, Alloy 2 = T1- Mo{sub 5}SiB{sub 2} (T2)- Mo{sub 3}Si, and Alloy 3 = Mo- T2- Mo{sub 3}Si. Tests were conducted at 1000 and 1100C in controlled atmospheres of dry air and wet air nominally containing 18, 55, and 150 Torr H{sub 2}O. The initial mass loss of each alloy was approximately independent of the test temperature and moisture content of the atmosphere. The magnitude of these initial losses varied according to the Mo content of the alloys. All alloys formed a continuous, external silica scale that protected against further mass change after volatilization of the initially formed MoO{sub 3}. All alloys experienced a small steady state mass change, but the calculated rates cannot be quantitatively compared due to statistical uncertainty in the individual mass measurements. Of particular interest is that Alloy 3, which contains a significant volume fraction of Mo metal, formed a protective scale. All alloys formed varying amounts of subscale Mo and MoO{sub 2}. This implies that oxygen transport through the external silica scale has been significantly reduced. For all alloys, water vapor accelerated the growth of a multiphase interlayer at the silica scale/unoxidized alloy interface. This interlayer is likely composed of fine Mo and MoO{sub 2} that is dispersed within a thin silica matrix. Alloy 3 was particularly sensitive to water accelerated growth of this interlayer. At 1100 C, the scale thickness after 300 hours increased from about 20 mm in dry air to nearly 100 mm in wet air.

  16. Effect of Nano-ZrO2 on the Microstructure and High Temperature Tribological Properties of MoSi2 Coating

    NASA Astrophysics Data System (ADS)

    Yan, Jianhui; Zhang, Zhi; Liu, Longfei; Xu, Hongmei; Mao, Zhengyu

    2013-08-01

    Molybdenum disilicide (MoSi2)-based composite coating using nano-ZrO2 as an additive was deposited on a nickel-based alloy by air plasma spraying, and the phase composition and microstructure of the composite coating were characterized by x-ray diffraction (XRD) and scanning electron microscope. The high-temperature abrasive wear properties of the ZrO2-MoSi2 composite coating were compared with the pure MoSi2 coating at 1100 °C. The XRD results show that there exists mutual transformation between T-MoSi2 and H-MoSi2 phase and part of Mo-rich phases are formed because of oxidization during the spraying processing. The addition of nano-ZrO2 could improve the adhesion between the splats, prevent cracking along the interface between the splats, and purify the boundaries. The ZrO2-MoSi2 composite coating exhibits improved wear resistance compared with the pure MoSi2 coating. The addition of nano-ZrO2 could effectively mitigate the adhesion wear and brittle delamination of the MoSi2 coating.

  17. Pesting of the high-temperature intermetallic MoSi2

    NASA Astrophysics Data System (ADS)

    Chou, T. C.; Nieh, T. G.

    1993-12-01

    Degradation resulting from environmental effects on the properties of high-temperature intermetallics has recently stimulated much interest in the materials science community. Most notably, iron, nickel, and titanium aluminides were found to be more ductile at room temperature when tested in vacuum or dry oxygen as compared to laboratory air. Environmental oxidation can also degrade materials to a measurable, sometimes catastrophic, extent. For example, an important oxidation-induced degradation phenomenon observed in intermetallics is pest disintegration. It was first observed in molybdenum disilicide in 1955. Since then, pest disintegration has been reported in many intermetallics, including silicides, aluminides, and beryllides. This article examines the pesting of MoSi2 and presents kinetic processes responsible for pesting.

  18. Shock compression of Mo-Si powder mixtures using recovery and instrumented experiments

    NASA Astrophysics Data System (ADS)

    Vandersall, Kevin S.; Thadhani, Naresh N.

    2000-04-01

    The reaction behavior of Mo-Si powder mixtures was investigated utilizing shock recovery experiments and time resolved (instrumented) measurements. Recovery experiments revealed the formation of reaction products with two distinct microstructures, suggesting product formation via "shock-induced" and "shock-assisted" reaction mechanisms. Instrumented experiments were performed using the Georgia Tech single-stage gas gun in the velocity range of 500 m/s to 1 km/s. PVDF stress gages were placed at the front and rear surfaces of the powder mixture sample, to record the input and propagated-wave profiles. The instrumented experiments allowed investigation of the crush strength and the threshold for shock-induced reaction initiation in the Mo+2Si powder mixture. Experiments performed at stresses exceeding the crush strength, showed possible evidence of reaction based on expansion observed in the pressure-volume behavior.

  19. Control of lateral thickness gradients of Mo-Si multilayer on curved substrates using genetic algorithm.

    PubMed

    Yu, Bo; Jin, Chunshui; Yao, Shun; Li, Chun; Wang, Hui; Zhou, Feng; Guo, Benyin; Xie, Yao; Liu, Yu; Wang, Liping

    2015-09-01

    An inversion method based on a genetic algorithm has been developed to control the lateral thickness gradients of a Mo-Si multilayer deposited on curved substrates by planar magnetron sputtering. At first, the sputtering distribution of the target is inversed from coating thickness profiles of flat substrates at different heights. Then, the speed profiles of substrates sweeping across the target are optimized according to the desired coating thickness profiles of the primary and secondary mirrors in a two-bounce projection system. The measured coating thickness profiles show that the non-compensable added figure error is below 0.1 nm rms, and the wavelength uniformity across each mirror surface is within ±0.2% P-V. The inversion method introduced here exhibits its convenience in obtaining the sputtering distribution of the target and efficiency in coating iterations during process development. PMID:26368686

  20. TEM characterization of invariant line interfaces and structural ledges in a Mo-Si alloy

    SciTech Connect

    Xiao, S.Q.; Dahmen, U.; Maloy, S.A.; Heuer, A.H.

    1995-06-01

    Two distinct <1{bar 1}0> lath morphologies of Mo{sub 5}Si{sub 3} precipitates observed in MoSi{sub 2} differ in their cross-sectional shape and lattice orientation. Type I laths exhibit a rectangular cross section, with interfaces parallel to low-index planes, while Type II laths are parallelogram-shaped, with their major interface at 13{degree} to the Type I precipitate. The corresponding orientation relationships differ by a 1.8{degree} rotation around the lath axis. In this study, the difference between the two characteristic morphologies and orientation relationships is shown to be the formation of an invariant line strain for Type II precipitates. On an atomic scale, both interfaces have a terrace and ledge structure but differ in the stacking sequence of interfacial ledges associated with partial dislocations. The structural unit model and the invariant line model predict identical interface geometries which agree closely with the observations.

  1. High reflectance-low stress Mo-Si multilayer reflective coatings

    DOEpatents

    Montcalm, Claude; Mirkarimi, Paul B.

    2000-01-01

    A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

  2. Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings

    DOEpatents

    Montcalm, Claude; Mirkarimi, Paul B.

    2001-01-01

    A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

  3. Characterization of Mo-SiO{sub 2} functionally graded materials

    SciTech Connect

    Ishibashi, H; Tobimatsu, T.; Matsumoto, T.; Hayashi, K.; Tomsia, A.P.; Saiz, E.

    2000-01-01

    Mo/SiO{sub 2} functionally graded materials (FGMs) have been prepared by combined slip casting and sedimentation techniques. The final, sintered samples have a gradient in molybdenum content with a maximum value of {approximately}20-25 vol% Mo. At one edge, the FGM is a good electrical conductor (for approximately one third of the total length), while the opposite end is composed mainly of fused SiO2. The variation of electrical resistivity, hardness, toughness and thermal expansion along the gradient has been analyzed. FGMs sintered in vacuum contained a small amount of Mo oxide ({approximately}2 wt%) as a third phase. The oxide originated from the starting Mo powders and oxidation during presintering. The oxide was in the form of discrete particles and did not appreciably affect the measured properties. Mo content had the expected effect on the FGM properties-an increase in Mo increases resistivity, thermal expansion, and toughness.

  4. Characterization of Mo-SiO{sub 2} functionally graded materials

    SciTech Connect

    Ishibashi, H.; Tobimatsu, H.; Matsumoto, T.; Hayashi, K.; Tomsia, A.P.; Saiz, E.

    2000-01-01

    Mo/SiO{sub 2} functionally graded materials (FGMs) have been prepared by combined slip casting and sedimentation techniques. The final, sintered samples have a gradient in molybdenum content, with a maximum value of {approximately}20 to 25 vol pct Mo. At one edge, the FGM is a good electrical conductor (for approximately one-third of the total length), which the opposite end is composed mainly of fused SiO{sub 2}. The variation of electrical resistivity, hardness, toughness, and thermal expansion along the gradient has been analyzed. The FGMs sintered in vacuum contained a small amount of Mo oxide ({approximately}2 wt pct) as a third phase. The oxide originated from the starting Mo powders and oxidation during presintering. The oxide was in the form of discrete particles and did not appreciably affect the measured properties. The Mo content had the expected effect on the FGM properties; an increase in Mo increases resistivity, thermal expansion, and toughness.

  5. Interfaces in MoSi{sub 2}-SiC in situ composites synthesized by melt processing

    SciTech Connect

    Tilly, D.J.; Loefvander, J.P.A.; Levi, C.G.; DeGraef, M.

    1997-09-01

    Interfaces between the primary {beta}-SiC and the surrounding MoSi{sub 2} matrix in melt-synthesized in situ composites have been investigated, with emphasis on the chemistry and crystallographic relationships developed during solidification. Primary SiC growth occurs with {l_brace}002{r_brace} and {l_brace}111{r_brace} facets, both of which are found to template the subsequent nucleation and epitaxial growth of the MoSi{sub 2} matrix. Eight independent orientation relationships (ORs) were identified, involving a number of combinations of planes. The interfacial relationships were rationalized using coincident site lattice arguments as well as energetic simulations based on the Grey-Bohr algorithm. The latter analysis suggests that the multiplicity of relationships arises from local effects associated with the size and shape of the adsorbate layers preceding the formation of the MoSi{sub 2} nuclei. An amorphous carbon layer, 2- to 5-nm thick, was detected at all interfaces and some of the matrix grain boundaries. This interphase is believed to evolve by solid-state precipitation of C during postsolidification cooling and is, in principle, metastable. The C interphase enables easy debonding and thus may have important implications for the mechanical performance of materials involving SiC/MoSi{sub 2} constituents.

  6. Development and Characterization of SiC)/ MoSi2-Si3N4(p) Hybrid Composites

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G.

    1998-01-01

    Intermetallic compound MoSi2 has long been known as a high temperature material that has excellent oxidation resistance and electrical/thermal conductivity. Also its low cost, high melting point (2023 C), relatively low density (6.2 g/cu cm versus 9 g/cu cm for current engine materials), and ease of machining, make it an attractive structural material. However, the use of MoSi2 has been hindered due to its poor toughness at low temperatures, poor creep resistance at high temperatures, and accelerated oxidation (also known as 'pest' oxidation) at temperatures between approximately 450 and 550 C. Continuous fiber reinforcing is very effective means of improving both toughness and strength. Unfortunately, MoSi2 has a relatively high coefficient of thermal expansion (CTE) compared to potential reinforcing fibers such as SiC. The large CTE mismatch between the fiber and the matrix resulted in severe matrix cracking during thermal cycling. Addition of about 30 to 50 vol % of Si3N4 particulate to MoSi2 improved resistance to low temperature accelerated oxidation by forming a Si2ON2 protective scale and thereby eliminating catastrophic 'pest failure'. The Si3N4 addition also improved the high temperature creep strength by nearly five orders of magnitude, doubled the room temperature toughness and significantly lowered the CTE of the MoSi2 and eliminated matrix cracking in SCS-6 reinforced composites even after thermal cycling. The SCS-6 fiber reinforcement improved the room temperature fracture toughness by seven times and impact resistance by five times. The composite exhibited excellent strength and toughness improvement up to 1400 C. More recently, tape casting was adopted as the preferred processing of MoSi2-base composites for improved fiber spacing, ability to use small diameter fibers, and for lower cost. Good strength and toughness values were also obtained with fine diameter Hi-Nicalon tow fibers. This hybrid composite remains competitive with ceramic matrix

  7. Synthesis and analysis of Mo-Si-B based coatings for high temperature oxidation protection of ceramic materials

    NASA Astrophysics Data System (ADS)

    Ritt, Patrick J.

    The use of Ni-based superalloys in turbine engines has all but been exhausted, with operating temperatures nearing the melting point of these materials. The use of ceramics in turbine engines, particularly ceramic matrix composites such as SiC/C and SiC/SiC, is of interest due to their low density and attractive mechanical properties at elevated temperatures. The same materials are also in consideration for leading edges on hypersonic vehicles. However, SiC-based composites degrade in high temperature environments with low partial pressures of oxygen due to active oxidation, as well as high temperature environments containing water or sand. The need for a protective external coating for SiC-based composites in service is obvious. To date, no coating investigated for SiC/C or SiC/SiC has been proven to be resistant to oxidation and corrosion at intermediate and high temperatures, as well as in environments deficient in oxygen. The Mo-Si-B coating shows great promise in this area, having been proven resistant to attack from oxidation at extreme temperatures, from water vapor and from calcia-magnesia-aluminosilicate (CMAS). The adaptation of the Mo-Si-B coating for ceramic materials is presented in detail here. Evaluation of the coating under a range of oxidation conditions as well as simulated re-entry conditions confirms the efficacy of the Mo-Si-B based coating as protection from catastrophic failure. The key to the oxidation and corrosion resistance is a robust external aluminoborosilica glass layer that forms and flows quickly to cover the substrate, even under the extreme simulated re-entry conditions. Suppression of active oxidation of SiC, which may occur during atmospheric re-entry and hypersonic flight trajectories, has also been examined. In order to adapt the Mo-Si-B based coating to low partial pressures of oxygen and elevated temperatures, controlled amounts of Al were added to the Mo-Si-B based coating. The resulting coating decreased the inward

  8. Growth of Oriented C11(b) MoSi(2) Bicrystals Using a Modified Czochralski Technique

    SciTech Connect

    Chu, F.; Garrett, J.D.; McClellan, K.J.; Michael J.R.; Mitchell, T.E.; Peralta, P.

    1999-06-02

    Oriented bicrystals of pure C11b MoSi2 have been grown in a tri-arc furnace using the Czochralski technique. Two single crystal seeds were used to initiate the growth. Each seed had the orientation intended for one of the grains of the bicrystals, which resulted in a 60° twist boundary on the (110) plane. Seeds were attached to a water-cooled seed rod, which was pulled at 120 mm/h with the seed rod rotating at 45 rpm. The water- cooled copper hearth was counter-rotated at 160 rpm. Asymmetric growth ridges associated with each seed crystal were observed during growth and confirmed the existence of a bicrystal. It was also found that careful alignment of the seeds was needed to keep the grain boundary from growing out of the boule. The resulting boundary was characterized by imaging and crystallographic techniques in a scanning electron microscope. The boundary was found to be fairly sharp and the misorientation between the grains remained within 2° from the disorientation between the seeds.

  9. Prevention of MoSi multilayer reflection loss in EUVL tools

    NASA Astrophysics Data System (ADS)

    Meiling, Hans; Mertens, Bas; Stietz, Frank; Wedowski, Marco; Klein, Roman; Kurt, Ralph; Louis, Eric; Yakshin, Andrey E.

    2001-12-01

    Extreme ultraviolet lithography requires vacuum conditions in the optical train. In order to maintain sufficient energy throughput, reflection reduction of multilayer mirrors due to contamination has to be minimized. We report on oxidation and carbonization experiments on MoSi mirrors under exposure with EUV radiation from a synchrotron. To mimic the effects of EUV radiation we also exposed samples using an electron gun. The oxidation rate was found to be ~0.015 nm/h per mW/mm2 of EUV radiation under vacuum conditions that are typical for a high throughput EUVL system, I.e. 10-6 mbar H2O. This oxidation can to a large extend be suppressed by using smart gas blend strategies during exposure, e.g. using ethanol. A deposition rate of 0.25 nm/h was found when the hydrocarbon pressure of Fomblin was reduced to 10(superscript -9 mbar. We demonstrate that carbonization can be suppressed by admitting oxygen during electron gun exposure.

  10. High-efficiency superconducting nanowire single-photon detectors fabricated from MoSi thin-films

    NASA Astrophysics Data System (ADS)

    Verma, V. B.; Korzh, B.; Bussières, F.; Horansky, R. D.; Dyer, S. D.; Lita, A. E.; Vayshenker, I.; Marsili, F.; Shaw, M. D.; Zbinden, H.; Mirin, R. P.; Nam, S. W.

    2015-12-01

    We demonstrate high-efficiency superconducting nanowire single-photon detectors (SNSPDs) fabricated from MoSi thin-films. We measure a maximum system detection efficiency (SDE) of 87 +- 0.5 % at 1542 nm at a temperature of 0.7 K, with a jitter of 76 ps, maximum count rate approaching 10 MHz, and polarization dependence as low as 3.4 +- 0.7 % The SDE curves show saturation of the internal efficiency similar to WSi-based SNSPDs at temperatures as high as 2.3 K. We show that at similar cryogenic temperatures, MoSi SNSPDs achieve efficiencies comparable to WSi-based SNSPDs with nearly a factor of two reduction in jitter.

  11. Composition and temperature dependences of site occupation for Al, Cr, W, and Nb in MoSi2

    NASA Astrophysics Data System (ADS)

    Li, Xiao-Ping; Sun, Shun-Ping; Yu, Yun; Wang, Hong-Jin; Jiang, Yong; Yi, Dan-Qing

    2015-12-01

    The composition and temperature dependences of site occupation for Al, Cr, W, and Nb in MoSi2 are investigated by using a thermodynamics model and first principles calculations. A simple parameter measuring the substitution energy difference between Si and Mo sites reflects the nature of site occupancy. At 0 K, these elements prefer Si sites in Mo-rich and Mo sites in Si-rich, and show no site preference in stoichiometric MoSi2. At elevated temperature, the site occupation behaviors show strong dependence on both composition and temperature. Some calculated results have been certified in previous experiments. Project supported by the National Natural Science Foundation of China (Grant No. 51401093) and the Natural Science Foundation of Jiangsu Province, China (Grant No. BK20130233).

  12. Pest resistant MoSi2-based materials containing in-situ grown .beta.-Si3N4 whiskers

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    2002-01-01

    A MoSi.sub.2 pest resistant material includes in-situ grown .beta.-Si.sub.3 N.sub.4 whiskers. In addition to excellent pest resistance, the material provides a lower coefficient of thermal expansion for better match with continuous reinforcing fibers such as SiC fibers. A two stage heating and pressing production technique enables lower temperature processing with substantially full densification.

  13. Pest resistant MoSi2-based materials containing in-situ grown .beta.-Si3N4whiskers

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    2001-01-01

    A MoSi.sub.2 pest resistant material includes in-situ grown .beta.-Si.sub.3 N.sub.4 whiskers. In addition to excellent pest resistance, the material provides a lower coefficient of thermal expansion for better match with continuous reinforcing fibers such as SiC fibers. A two stage heating and pressing production technique enables lower temperature processing with substantially full densification.

  14. Al-MoSi2 Composite Materials: Analysis of Microstructure, Sliding Wear, Solid Particle Erosion, and Aqueous Corrosion

    NASA Astrophysics Data System (ADS)

    Gousia, V.; Tsioukis, A.; Lekatou, A.; Karantzalis, A. E.

    2016-08-01

    In this effort, AMCs reinforced with new intermetallic phases, were produced through casting and compared as far as their microstructure, sliding wear, solid particle erosion, and aqueous corrosion response. Casting was selected as a production method based on the concept: (a) ease-to-handle and low cost production route and (b) optimum homogeneity of the reinforcing phase distribution. The MoSi2 phase was produced through vacuum arc melting and the resulting drops were milled for 30 h to produce fine powder, the characteristics of which were ascertained through SEM-EDS and XRD analysis. MoSi2 was used as precursor source for the final reinforcing phase. The powder material was incorporated in molten Al1050 alloy to additions of 2, 5 and 10 vol.% respectively. Extensive reactivity between the molten Al and the MoSi2 particles was observed, leading to the formation of new reinforcing phases mainly of the Al-Mo system. In all cases, a uniform particle distribution was observed, mainly characterized by isolated intermetallic phases and few intermetallic phase clusters. Sliding wear showed a beneficial action of the reinforcing phase on the wear of the composites. Surface oxidation, plastic deformation, crack formation, and debris abrasive action were the main degradation features. The results of solid particle erosion showed that the mechanism is different as the impact angle and the vol.% change. Regarding the corrosion, the analysis revealed localized corrosion effects. The composite behavior was not altered significantly compared to that of the monolithic matrix.

  15. Development of Thermal Barrier Coating System with Superior Thermal Cyclic Properties with an Intermediate Layer Containing MoSi2

    NASA Astrophysics Data System (ADS)

    Sonoya, Keiji; Tobe, Shogo

    The authors have developed a method of improving the thermal cyclic resistance of the thermal barrier coating system that is deposited on gas turbine components. A conventional thermal barrier coating consists of a duplex system: a top coating and a bond coating. The developed system has a protective intermediate layer of MoSi2 which prevents oxidation of the bond coating. The conventional duplex plasma -sprayed coating was delaminated after 20 thermal cycles. On the other hand, the developed triple-layered coating system was not delaminated after 60 cycles. The reason for the enhanced resistance to thermal cycles of the developed triple-layered coating system is that the MoSi2 layer between the top coating and the bond coating has a self-repairing property. MoSi2 oxidizes to form SiO2, which seals the cracks and pores formed between the top coating and the bond coating. Thus, the formation of a thermally grown oxide(TGO), which causes the delamination of the coating, is prevented and the thermal cyclic resistance is improved.

  16. Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures

    PubMed Central

    Jiang, Hao; Li, Xiang Yuan; Chen, Ran; Shao, Xing Long; Yoon, Jung Ho; Hu, Xiwen; Hwang, Cheol Seong; Zhao, Jinshi

    2016-01-01

    SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality was recently extended to resistance switching random access memory, where the defective SiO2 played an active role as the resistance switching (RS) layer. In this report, the bias-polarity-dependent RS behaviours in the top electrode W-sputtered SiO2-bottom electrode Pt (W/SiO2/Pt) structure were examined based on the current-voltage (I-V) sweep. When the memory cell was electroformed with a negative bias applied to the W electrode, the memory cell showed a typical electronic switching mechanism with a resistance ratio of ~100 and high reliability. For electroforming with opposite bias polarity, typical ionic-defect-mediated (conducting filament) RS was observed with lower reliability. Such distinctive RS mechanisms depending on the electroforming-bias polarity could be further confirmed using the light illumination study. Devices with similar electrode structures with a thin intervening Si layer between the SiO2 and Pt electrode, to improve the RS film morphology (root-mean-squared roughness of ~1.7 nm), were also fabricated. Their RS performances were almost identical to that of the single-layer SiO2 sample with very high roughness (root-mean-squared roughness of ~10 nm), suggesting that the reported RS behaviours were inherent to the material property. PMID:26916050

  17. Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures

    NASA Astrophysics Data System (ADS)

    Jiang, Hao; Li, Xiang Yuan; Chen, Ran; Shao, Xing Long; Yoon, Jung Ho; Hu, Xiwen; Hwang, Cheol Seong; Zhao, Jinshi

    2016-02-01

    SiO2 is the most significantly used insulator layer in semiconductor devices. Its functionality was recently extended to resistance switching random access memory, where the defective SiO2 played an active role as the resistance switching (RS) layer. In this report, the bias-polarity-dependent RS behaviours in the top electrode W-sputtered SiO2-bottom electrode Pt (W/SiO2/Pt) structure were examined based on the current-voltage (I-V) sweep. When the memory cell was electroformed with a negative bias applied to the W electrode, the memory cell showed a typical electronic switching mechanism with a resistance ratio of ~100 and high reliability. For electroforming with opposite bias polarity, typical ionic-defect-mediated (conducting filament) RS was observed with lower reliability. Such distinctive RS mechanisms depending on the electroforming-bias polarity could be further confirmed using the light illumination study. Devices with similar electrode structures with a thin intervening Si layer between the SiO2 and Pt electrode, to improve the RS film morphology (root-mean-squared roughness of ~1.7 nm), were also fabricated. Their RS performances were almost identical to that of the single-layer SiO2 sample with very high roughness (root-mean-squared roughness of ~10 nm), suggesting that the reported RS behaviours were inherent to the material property.

  18. Preventing the accelerated low-temperature oxidation of MoSi{sub 2} (pesting) by the application of superficial alkali-salt layers

    SciTech Connect

    Cockeram, B.V.; Wang, G.; Rapp, R.A.

    1996-02-01

    Previous work showed that MoSi{sub 2} diffusion coatings formed by a NaF-activated pack cementation process did not pest. A Na-Al-oxide by-product layer resulting from the NaF activator formed a Na-silicate layer to passivate MoSi{sub 2}. Superficial NaF layers were then used to prevent the pesting of MoSi{sub 2} diffusion coatings that were otherwise susceptible to pest disintegration. In this study, the use of superficial alkali-salt layers to prevent the accelerated oxidation of bulk MoSi{sub 2} at 500{degrees}C is investigated more broadly. The application of Na-halide, KF, LiF, Na{sub 2}B{sub 4}O{sub 7}, or Na-silicate layers prior to oxidation prevented accelerated oxidation and pesting for at least 2000 hr at 500{degrees}C in air. The formation of a fast-growing, Na-silicate layer passivates MoSi{sub 2}. The MoO{sub 3} that forms during oxidation absorbs sodium by intercalation to form stable Na-molybdate precipitates. Na{sub 2}B{sub 4}O{sub 7}, Na-silicate, LiF, and KF prevented accelerated oxidation at 500{degrees}C by a similar mechanism. The application of alkali-halide salts is a simple, effective solution to prevent the accelerated oxidation and pesting of MoSi{sub 2}.

  19. Development of Tough, Strong, and Pest-Resistant MoSi2-(Beta)Si3N4 Composites for High-Temperature Structural Applications

    NASA Technical Reports Server (NTRS)

    Hebsur, M. G.; Choi, S. R.; Whittenberger, J. D.; Salem, J. A.; Noebe, R. D.

    2001-01-01

    A new MoSi2-base composite was developed that contains in-situ reinforcement of whisker-type beta-Si3N4 grains in a MoSi2 matrix. The advantages of this in-situ reinforced MoSi2-Si3N4 are lower density, higher fracture toughness and better strength than typical MoSi2 alloys, combined with excellent environmental and pest resistance. The average fracture toughness of the in-situ reinforced material determined by one technique was 12.2 MPa.m(exp 1/2) compared to 4.9 to 5.5 MPa.m(exp 1/2) for similar materials with the exception that the beta-Si3N4 had a blocky morphology as opposed to the whisker-like morphology typical of the in-situ toughened material. This MoSi2-(beta)Si3N4 was also resistant to pesting at intermediate temperatures (400 to 600 C) even when precracked or under applied load; conditions that would quickly reduce typical MoSi2 alloys to oxidized powder.

  20. Behavior of W-SiC/SiC dual layer tiles under LHD plasma exposure

    NASA Astrophysics Data System (ADS)

    Mohrez, Waleed A.; Kishimoto, Hirotatsu; Kohno, Yutaka; Hirotaki, S.; Kohyama, Akira

    2013-11-01

    Towards the early realization of fusion power reactors, high performance first wall and plasma facing components (PFCs) are essentially required. As one of the biggest challenges for this, high heat flux component (HHFC) design and R & D has been emphasized. This report provides the high performance HHFC materials R & D status and the first plasma exposure test result from large helical device (LHD). W-SiC/SiC dual layer tiles (hereafter, W-SiC/SiC) were developed by applied NITE process. This is the realistic concept of tungsten armor with ceramic composite substrates for fusion power reactors. The dual layer tiles were fabricated and tested their survival under the LHD divertor plasma exposure (Nominally 10 MW/m2 maximum heat load for 6 s operation cycle). The microstructure evolution, including crack and pore formation, was analyzed, besides the behavior of bonding layer between tungsten and SiC/SiC was evaluated by C-scanning images of ultrasonic method and Electron probe Micro-analyzer (EPMA). Thermal analysis was conducted by finite element method, where ANSYS code release 13.0 was used.

  1. Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering

    SciTech Connect

    Voronov, D. L.; Gawlitza, Peter; Cambie, Rossana; Dhuey, Scott; Gullikson, Eric M.; Warwick, Tony; Braun, Stefan; Yashchuk, Valeriy V.; Padmore, Howard A.

    2012-05-07

    Deposition of multilayers on saw-tooth substrates is a key step in the fabrication of multilayer blazed gratings (MBG) for extreme ultraviolet and soft x-rays. Growth of the multilayers can be perturbed by shadowing effects caused by the highly corrugated surface of the substrates, which results in distortion of the multilayer stack structure and degradation of performance of MBGs. In this study, to minimize the shadowing effects, we used an ion-beamsputtering machine with a highly collimated atomic flux to deposit Mo/Si multilayers on saw-tooth substrates. The sputtering conditions were optimized by finding a balance between smoothening and roughening processes in order to minimize degradation of the groove profile in the course of deposition and at the same time to keep the interfaces of a multilayer stack smooth enough for high efficiency. An optimal value of energy of 200 eV for sputtering Kr+ ions was found by deposition of test multilayers on flat substrates at a range of ion energies. Two saw-tooth substrates were deposited at energies of 200 eV and 700 eV for the sputtering ions. It was found that reduction of the ion energy improved the blazing performance of the MBG and resulted in a 40% gain in the diffraction efficiency due to better replication of the groove profile by the multilayer. As a result of the optimization performed, an absolute diffraction efficiency of 28.8% was achieved for the 2nd blaze order of the MBG with a groove density of 7350 lines/mm at a wavelength of 13.5 nm. Lastly, details of the growth behavior of the multilayers on flat and saw-tooth substrates are discussed in terms of the linear continuous model of film growth.

  2. Development and characterization of high temperature stable Ta-W-Si-C amorphous metal gates

    SciTech Connect

    Grubbs, Melody E.; Clemens, Bruce M.; Zhang Xiao; Deal, Michael; Nishi, Yoshio

    2010-11-29

    Threshold voltage variability ({sigma}{sub Vth}) due to the polycrystalline nature of current metal gates has been identified as a problem in future generations of complementary metal oxide semiconductor (CMOS) devices. Amorphous metal Ta{sub 40}W{sub 40}Si{sub 10}C{sub 10} gates are introduced in this work as a remedy. It was found that Ta-W-Si-C films remain amorphous at temperatures as high as 1120 deg. C, have n-type work functions, and are stable on HfO{sub 2}. This alloy is a promising gate-first compatible material that has the potential to significantly reduce {sigma}{sub Vth}.

  3. Microstructural and mechanical characterization of W/SiC bonding for structural material in fusion

    NASA Astrophysics Data System (ADS)

    Kishimoto, H.; Shibayama, T.; Shimoda, K.; Kobayashi, T.; Kohyama, A.

    2011-10-01

    The SiC/SiC composites are expected to be employed as structural materials in fusion reactors after DEMO. Tungsten may be used as armor material of divertor to protect from the high temperature heat flux. An advanced SiC/SiC composite, NITE SiC/SiC, has excellent resistance to high stress and temperature, and diffusion and sinter bonding methods using high temperature are able to join SiC/SiC composites. This work evaluates the microstructure of interphases when tungsten is joined to SiC to screen potential bonding techniques. The W/SiC joints were produced by diffusion bonding, sinter bonding and liquid phase sinter bonding methods using the hot-pressing methods. Evaluation by SEM, EPMA, TEM and shear test showed the promise of these bonding methods.

  4. Effects of Wet Air and Synthetic Combustion Gas Atmospheres on the Oxidation Behavior of Mo-Si-B Alloys

    SciTech Connect

    Kramer, M.J.; Thom, A.J.; Mandal, P.; Behrani, V.; Akinc, M.

    2003-04-24

    Continuing our work on understanding the oxidation behavior of multiphase composite alloys based on the Mo-Si-B system, we investigated three alloys in the Mo-Si-B system, designated as A1, A2, and A3. The nominal phase assemblages of these alloys are: A1 = Mo{sub 5}Si{sub 3}B{sub x} (T1)-MoSi{sub 2}-MoB, A2 = T1-Mo{sub 5}SiB{sub 2} (T2)-Mo{sub 3}Si, and A3 = Mo-T2-Mo{sub 3}Si. Our previous work showed that for exposures to 1100 C, all alloys formed a protective oxide scale in dry air. Exposures to wet air containing about 150 Torr water promoted the formation of a multiphase layer near the scale/alloy interface composed of Mo and MoO{sub 2}. Interrupted mass loss measurements indicated a near zero mass change. In the present study, isothermal mass measurements were conducted in order to quantitatively determine the oxidation rate constants at 1000 C in both dry and wet air. These measurements are critical for understanding the nature of scale development during the initial exposure, as well as the nature of scale stability during the long-term exposure. Isothermal measurements were also conducted at 1600 C in dry air to make an initial determination of alloy stability with respect to Vision 21 goals. We also conducted alloy oxidation testing in a synthetic oxidizing combustion atmosphere. Alloys were exposed up to 300 hours at 1100 C to a gas mixture having an approximate gas composition of N{sub 2} - 13 CO{sub 2} - 10 H{sub 2}O - 4 O{sub 2}. This gas composition simulates oxidizing flue gas, but does not contain a sulfidizing agent that would also be present in flue gas. The oxidized samples were carefully analyzed by SEM/EDS. This analysis will be discussed to provide an understanding of the role of water vapor and the synthetic combustion atmosphere on the oxidative stability of Mo-Si-B alloys.

  5. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure.

    PubMed

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-02-28

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications.

  6. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure

    PubMed Central

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-01-01

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications. PMID:24577416

  7. Synergistic toughening of hard, nacre-mimetic MoSi2 coatings by self-assembled hierarchical structure

    NASA Astrophysics Data System (ADS)

    Xu, Jiang; Zhao, Xiaoli; Munroe, Paul; Xie, Zonghan

    2014-02-01

    Like many other intermetallic materials, MoSi2 coatings are typically hard, but prone to catastrophic failure due to their low toughness at ambient temperature. In this paper, a self-assembled hierarchical structure that closely resembles that of nacre (i.e., mother of pearl) was developed in a MoSi2-based coating through a simple, yet cost-effective, depostion technique. The newly formed coating is tough and can withstand multiple indentations at high loads. Key design features responsible for this remarkable outcome were identified. They include a functionally graded multilayer featuring elastic modulus oscillation, varying sublayer thickness and a columnar structure that are able to attenuate stress concentrations; interlocking boundaries between adjacent sublayers that improve the bonding and arrest the cracks; a transitional layer that bridges the coating and substrate and facilitates load transfer. Moreover, the contributions of six important structural characteristics to damage resistance are quantified using finite elemnet analysis and in an additive manner (i.e., from low- to high-level complexity). The in-situ toughened coating is envisaged to enhance the mechanical performance and extend the lifespan of metal components used in safety-critical applications.

  8. PLASMA SPRAYED FUNCTIONALLY GRADED AND LAYERED MoSi2-A1203 COMPOSITES FOR HIGH TEMPERATURE SENSOR SHEATH APPLICATION

    SciTech Connect

    R. VAIDYA; ET AL

    2001-01-01

    Protective sensor sheaths are required in the glass industry for sensors that are used to measure various properties of the melt. Molten glass presents an extremely corrosive elevated temperature environment, in which only a few types of materials can survive. Molybdenum disilicide (MoSi{sub 2}) has been shown to possess excellent corrosion resistance in molten glass, and is thus a candidate material for advanced sensor sheath applications. Plasma spray-forming techniques were developed to fabricate molybdenum dilicide-alumina (Al{sub 2}O{sub 3}) laminate and functionally graded composite tubes with mechanical properties suitable for sensor sheath applications. These functionally graded materials (FGMs) were achieved by manipulating the powder hoppers and plasma torch translation via in-house created computer software. Molybdenum disilicide and alumina are thermodynamically stable elevated temperature materials with closely matching thermal expansion coefficients. Proper tailoring of the microstructure of these MoSi{sub 2}-Al{sub 2}O{sub 3} composites can result in improved strength, toughness, and thermal shock resistance. This study focuses on the mechanical performance of these composite microstructures.

  9. Impression creep behavior of atmospheric plasma sprayed and hot pressed MoSi{sub 2}/Si{sub 3}N{sub 4}

    SciTech Connect

    Hollis, K.J.; Butt, D.P.; Castro, R.G.

    1997-09-01

    The use of MoSi{sub 2} as a high temperature oxidation resistant structural material is hindered by its poor elevated temperature creep resistance. The addition of second phase Si{sub 3}N{sub 4} holds promise for improving the creep properties of MoSi{sub 2} without decreasing oxidation resistance. The high temperature impression creep behavior of atmospheric plasma sprayed (APS) and hot pressed (HP) MoSi{sub 2}/Si{sub 3}N{sub 4} composites was investigated. Values for steady state creep rates, creep activation energies, and creep stress exponents were measured. Grain boundary sliding and splat sliding were found to be the dominant creep mechanisms for the APS samples while grain boundary sliding and plastic deformation were found to be the dominant creep mechanisms for the HP samples.

  10. Structural properties of reactively sputtered W-Si-N thin films

    SciTech Connect

    Vomiero, A.; Boscolo Marchi, E.; Quaranta, A.; Della Mea, G.; Brusa, R. S.; Mariotto, G.; Felisari, L.; Frabboni, S.; Tonini, R.; Ottaviani, G.; Mattei, G.; Scandurra, A.; Puglisi, O.

    2007-08-01

    Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W{sub 5}Si{sub 3} and WSi{sub 2} targets using several nitrogen partial pressures. The films have been thermal annealed in the 600-1000 deg. C temperature range and a wide region of the W-Si-N ternary phase diagram has been explored by changing the N{sub 2}/Ar ratio during the deposition. Multitechnique approach was adopted for the analysis of the samples. Composition has been determined via ion beam analysis; chemical states were investigated using x-ray photoelectron spectroscopy (XPS); crystalline structure was studied using transmission electron microscopy (TEM) and x-ray diffraction (XRD) and surface morphology by scanning electron microscope. The films deposited in pure argon atmosphere are tungsten rich and approach the target contents as N{sub 2}/Ar ratio is varied during deposition. Tungsten enrichment in the films is caused by resputtering of silicon which can be inhibited by the formation of silicon nitride, allowing films with Si/W ratio closer to the target compositions. The higher capability to form nitrides with silicon than with tungsten favors enhancement of nitrogen content in samples deposited from the silicon rich target (WSi{sub 2}). The samples with excess nitrogen content have shown losses of this element after thermal treatment. XPS measurements show a break of W-N bonds caused by thermal instability of tungsten nitrides. TEM and XRD revealed the segregation of tungsten in form of metallic or silicide nanoclusters in samples with low nitrogen content (W{sub 58}Si{sub 21}N{sub 21} and W{sub 24}Si{sub 42}N{sub 34}). High amounts of nitrogen were revealed to be highly effective in inhibiting metallic cluster coalescence. Measurements of electrical resistivity of as deposited films were performed using four point probe technique. They were found to lie in the range between 0.4 and 79 m{omega} cm depending on sample composition.

  11. Demonstration of the high collection efficiency of a broadband Mo/Si multilayer mirror with a graded multilayer coating on an ellipsoidal substrate.

    PubMed

    Ichimaru, S; Takenaka, H; Namikawa, K; Gullikson, E M; Maruyama, M; Oku, S

    2015-09-01

    A graded and broadband Mo/Si multilayer mirror for EUV spectroscopy is demonstrated. This mirror has an average reflectivity profile of 16% in the wavelength region from 15 nm to 17 nm and an effective area of 1100-1500 mm(2). This reflectivity is about 4 times larger than that of a standard Mo/Si multilayer mirror on a 1 in. diameter substrate, showing that the mirror can be used for measuring EUV fluorescence at wavelengths in the region around 15 nm to 17 nm. PMID:26429428

  12. Control of surface mobility for conformal deposition of Mo-Si multilayers on saw-tooth substrates

    NASA Astrophysics Data System (ADS)

    Voronov, D. L.; Anderson, E. H.; Gullikson, E. M.; Salmassi, F.; Warwick, T.; Yashchuk, V. V.; Padmore, H. A.

    2013-11-01

    Multilayer-coated blazed gratings (MBG) are the most promising solution for ultra-high resolution soft X-ray spectroscopy, since they can have very high groove density and provide high-order operation and very high diffraction efficiency. The performance of MBGs however depends critically on the conformal deposition of the multilayer (ML) stack on a saw-tooth substrate and the minimization of roughness. We present an analysis of the roughening and smoothing processes during growth of Mo/Si multilayers deposited over a range of pressures of Ar sputtering gas on flat and saw-tooth substrates. A Linear Continuum Model (LCM) of the film growth was used to understand the interplay between smoothing and roughening of the ML films and to predict the optimum conditions for deposition. The MBG coated under the optimal deposition conditions demonstrated high diffraction efficiency in the EUV and soft X-ray wavelength ranges

  13. Matrix grain characterisation by electron backscattering diffraction of powder metallurgy aluminum matrix composites reinforced with MoSi{sub 2} intermetallic particles

    SciTech Connect

    Corrochano, J. Hidalgo, P.; Lieblich, M.; Ibanez, J.

    2010-11-15

    Research highlights: Six extruded PM AA6061/MoSi{sub 2}/15p were processed with and without ball milling {yields} EBSD was used to characterise matrix grain size and grain orientation. {yields} Ball milling decreases matrix grain size to submicrometric level. {yields} Ball milling produces a more equiaxed microstructure and larger misorientation. {yields} Increasing milling time produces matrix texture randomization.

  14. PROCESSING, MICROSTRUCTURE AND CREEP BEHAVIOR OF MO-SI-B-BASED INTERMETALLIC ALLOYS FOR VERY HIGH TEMPERATURE STRUCTURAL APPLICATIONS

    SciTech Connect

    Vijay K. Vasudevan

    2005-02-08

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. During this year, the microstructure, bend strength and compressive creep behavior of a Mo-3Si-1B (in wt.%) alloy were studied. The microstructure of this alloy was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. The elastic limit strength of the alloy remained quite high until 1200 C with a value of 800MPa, but dropped rapidly thereafter to a value of 220 MPa at 1400 C. Results of compressive creep tests at 1200 C showed that the creep rates were quite high and varied nearly linearly with stress between 250 and 500 MPa, which suggests that diffusional mechanisms dominate the creep process. Microstructural observations of post-crept samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. These results and presented and discussed.

  15. High damping Al-Fe-Mo-Si/Zn-Al composites produced by rapidly solidified powder metallurgy process

    SciTech Connect

    Li, P.Y.; Dai, S.L.; Chai, S.C.; Li, Y.R.

    2000-05-10

    The metallic materials commonly used in aircraft and aerospace fields, such as aluminum and titanium alloys, steels, etc., show extremely low damping capacity (usually of the order of or less than 10{sup {minus}3}). Thus, some problems related to vibration may emerge and influence the reliability, safety and life of airplanes, satellites, etc. It has been reported that almost two thirds of errors for rockets and satellites are related to vibration and noise. One effective way to solve these vibration-related problems is to adopt high damping metallic materials. Conventional high damping alloys exhibit damping capacity above 10{sup {minus}2}, however, their densities are usually great than 5 x 10{sup 3} kg m{sup {minus}3}, or their strengths are less than 200 MPa (for alloys based on dislocation damping), making them impossible to be applied to aircraft and aerospace areas. Recently, some low-density high-damping metal/metal composites based on aluminum and high damping alloys have been developed in Beijing Institute of Aeronautical Materials (BIAM) by the rapidly solidified power metallurgy process. This paper aims to report the properties of the composites based on a high temperature Al-Fe-Mo-Si alloy and a high damping Zn-Al alloy, and compare them with that of 2618-T61 alloy produced by the ingot metallurgy process.

  16. Development of a multi-variate calibration approach for quantitative analysis of oxidation resistant Mo-Si-B coatings using laser ablation inductively coupled plasma mass spectrometry

    NASA Astrophysics Data System (ADS)

    Cakara, Anja; Bonta, Maximilian; Riedl, Helmut; Mayrhofer, Paul H.; Limbeck, Andreas

    2016-06-01

    Nowadays, for the production of oxidation protection coatings in ultrahigh temperature environments, alloys of Mo-Si-B are employed. The properties of the material, mainly the oxidation resistance, are strongly influenced by the Si to B ratio; thus reliable analytical methods are needed to assure exact determination of the material composition for the respective applications. For analysis of such coatings, laser ablation inductively coupled mass spectrometry (LA-ICP-MS) has been reported as a versatile method with no specific requirements on the nature of the sample. However, matrix effects represent the main limitation of laser-based solid sampling techniques and usually the use of matrix-matched standards for quantitative analysis is required. In this work, LA-ICP-MS analysis of samples with known composition and varying Mo, Si and B content was carried out. Between known analyte concentrations and derived LA-ICP-MS signal intensities no linear correlation could be found. In order to allow quantitative analysis independent of matrix effects, a multiple linear regression model was developed. Besides the three target analytes also the signals of possible argides (40Ar36Ar and 98Mo40Ar) as well as detected impurities of the Mo-Si-B coatings (108Pd) were considered. Applicability of the model to unknown samples was confirmed using external validation. Relative deviations from the values determined using conventional liquid analysis after sample digestion between 5 and 10% for the main components Mo and Si were observed.

  17. Structure and stress studies of low temperature annealed W/Si multilayers for the X-ray telescope.

    PubMed

    Huang, Qiushi; Zhang, Jinshuai; Qi, Runze; Yang, Yang; Wang, Fengli; Zhu, Jie; Zhang, Zhong; Wang, Zhanshan

    2016-07-11

    Low stress W/Si multilayer mirrors are demanded in the hard X-ray telescopes to achieve the high angular resolution. To reduce the stress of the as-deposited multilayer and maintain a high reflectivity, two groups of low-temperature annealing experiments were performed on the periodic multilayers with a d-spacing of ~3.8 nm. The temperature-dependent experiments show that the 150 °C annealing can slightly increase the reflectivity while the stress reduced only by 24%. Higher temperature annealing induced a larger reduction of the stress and the multilayer reached an almost zero stress state at 250 °C. The stress relaxation was accompanied by a small drop of reflectivity of ≤5% and a period compaction of <0.02 nm. The time-dependent experiments indicate that most of the stress changes occurred within the first 10 minutes while a prolonged annealing is not useful. The X-ray scattering and transmission electron microscopy were further used to study the microstructure changes of the multilayers. It is found that the W/Si multilayer exhibits an amorphous structure before and after annealing, while an enhanced diffusion and intermixing is the main reason for the stress relaxation and structure changes. PMID:27410835

  18. Structure and stress studies of low temperature annealed W/Si multilayers for the X-ray telescope.

    PubMed

    Huang, Qiushi; Zhang, Jinshuai; Qi, Runze; Yang, Yang; Wang, Fengli; Zhu, Jie; Zhang, Zhong; Wang, Zhanshan

    2016-07-11

    Low stress W/Si multilayer mirrors are demanded in the hard X-ray telescopes to achieve the high angular resolution. To reduce the stress of the as-deposited multilayer and maintain a high reflectivity, two groups of low-temperature annealing experiments were performed on the periodic multilayers with a d-spacing of ~3.8 nm. The temperature-dependent experiments show that the 150 °C annealing can slightly increase the reflectivity while the stress reduced only by 24%. Higher temperature annealing induced a larger reduction of the stress and the multilayer reached an almost zero stress state at 250 °C. The stress relaxation was accompanied by a small drop of reflectivity of ≤5% and a period compaction of <0.02 nm. The time-dependent experiments indicate that most of the stress changes occurred within the first 10 minutes while a prolonged annealing is not useful. The X-ray scattering and transmission electron microscopy were further used to study the microstructure changes of the multilayers. It is found that the W/Si multilayer exhibits an amorphous structure before and after annealing, while an enhanced diffusion and intermixing is the main reason for the stress relaxation and structure changes.

  19. PROCESSING, MICROSTRUCTURE AND CREEP BEHAVIOR OF Mo-Si-B-BASED INTERMETALLIC ALLOYS FOR VERY HIGH TEMPERATURE STRUCTURAL APPLICATIONS

    SciTech Connect

    Vijay K. Vasudevan

    2005-12-21

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. During this year, the compressive creep behavior of a Mo-3Si-1B (in wt.%) alloy at 1100 and 1200 C were studied and related to the deformation mechanisms through electron microscopy observations of microstructural changes and deformation structures. The microstructure of this alloy was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. Results of compressive creep tests at 1200 and 1100 C showed that the creep rates were quite high at stress levels between 250 and 500 MPa, Two minima in the creep strain rate versus strain data were noted, one at small strain values and the second at much larger strains. A stress exponent of 4.26 was obtained upon plotting the strain rate corresponding to the first minima versus stress, which suggests that dislocation climb and glide dominate the creep process in the early stages. On the other hand, the large strain, minimum creep rate versus stress data gave a stress exponent of {approx}1.18, which indicates diffusional mechanisms and recrystallization dominate the later stages of the creep process. At 1100 C, a stress exponent of 2.26 was obtained, which suggests that both diffusional and dislocation mechanisms contribute to the creep strain. Based on the minimum creep rate data at 1100 C and 1200 C, the activation energy for creep was determined to be 525 kJ/mole, which is somewhat higher than that reported for self diffusion in {alpha}-Mo. Microstructural observations of post-crept samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. In addition, TEM observations revealed the presence of recrystallized grains and sub-grain boundaries composed of dislocation arrays

  20. Processing, Microstructure and Creep Behavior of Mo-Si-B-Based Intermetallic Alloys for Very High Temperature Structural Applications

    SciTech Connect

    Vijay Vasudevan

    2008-03-31

    This research project is concerned with developing a fundamental understanding of the effects of processing and microstructure on the creep behavior of refractory intermetallic alloys based on the Mo-Si-B system. In the first part of this project, the compression creep behavior of a Mo-8.9Si-7.71B (in at.%) alloy, at 1100 and 1200 C was studied, whereas in the second part of the project, the constant strain rate compression behavior at 1200, 1300 and 1400 C of a nominally Mo-20Si-10B (in at.%) alloy, processed such as to yield five different {alpha}-Mo volume fractions ranging from 5 to 46%, was studied. In order to determine the deformation and damage mechanisms and rationalize the creep/high temperature deformation data and parameters, the microstructure of both undeformed and deformed samples was characterized in detail using x-ray diffraction, scanning electron microscopy (SEM) with back scattered electron imaging (BSE) and energy dispersive x-ray spectroscopy (EDS), electron back scattered diffraction (EBSD)/orientation electron microscopy in the SEM and transmission electron microscopy (TEM). The microstructure of both alloys was three-phase, being composed of {alpha}-Mo, Mo{sub 3}Si and T2-Mo{sub 5}SiB{sub 2} phases. The values of stress exponents and activation energies, and their dependence on microstructure were determined. The data suggested the operation of both dislocation as well as diffusional mechanisms, depending on alloy, test temperature, stress level and microstructure. Microstructural observations of post-crept/deformed samples indicated the presence of many voids in the {alpha}-Mo grains and few cracks in the intermetallic particles and along their interfaces with the {alpha}-Mo matrix. TEM observations revealed the presence of recrystallized {alpha}-Mo grains and sub-grain boundaries composed of dislocation arrays within the grains (in Mo-8.9Si-7.71B) or fine sub-grains with a high density of b = 1/2<111> dislocations (in Mo-20Si-10B), which

  1. Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2 -Si3N4.

    PubMed

    Hernández-Pinilla, D; Rodríguez-Palomo, A; Álvarez-Fraga, L; Céspedes, E; Prieto, J E; Muñoz-Martín, A; Prieto, C

    2016-06-01

    Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2-Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating-cooling cycles are shown here. PMID:27182544

  2. Spectral reflectance data of a high temperature stable solar selective coating based on MoSi2–Si3N4

    PubMed Central

    Hernández-Pinilla, D.; Rodríguez-Palomo, A.; Álvarez-Fraga, L.; Céspedes, E.; Prieto, J.E.; Muñoz-Martín, A.; Prieto, C.

    2016-01-01

    Data of optical performance, thermal stability and ageing are given for solar selective coatings (SSC) based on a novel MoSi2–Si3N4 absorbing composite. SSC have been prepared as multilayer stacks formed by silver as metallic infrared reflector, a double layer composite and an antireflective layer (doi: 10.1016/j.solmat.2016.04.001 [1]). Spectroscopic reflectance data corresponding to the optical performance of samples after moderate vacuum annealing at temperatures up to 600 °C and after ageing test of more than 200 h with several heating–cooling cycles are shown here. PMID:27182544

  3. Improvement of the Adhesion Strength of MoSi2-ZrB2 Coating by Optimizing Particle Spraying and Subsequent Heat Treatment

    NASA Astrophysics Data System (ADS)

    Lu, Wang; Qian-gang, Fu; Ning-kun, Liu; Jia, Sun

    2016-09-01

    A MoSi2-ZrB2 coating was prepared on SiC-coated C/C composites by supersonic plasma spraying, and the effects of particle diameter and subsequent heat treatment in argon at different temperatures on the adhesion strength were studied. The results show that the MoSi2-ZrB2 coating sprayed with an average powder diameter of 29.2 μm could melt thoroughly and form a dense structure without micro-pore, which results in a relatively good adhesion strength of 11.4 MPa compared with 9.2 and 8.6 MPa of the coatings sprayed with the powder diameter of 58.2 and 35.5 μm. The coating presents a decreasing porosity from 2.2 to 1.5% and an increasing adhesion strength from 11.6 to 16.9 MPa after heat treatment at 800 °C, which is mainly caused by slight sintering of SiO2 and B2O3

  4. Hot pressing effect on the shear bond strength of dental porcelain to CoCrMoSi alloy substrates with different surface treatments.

    PubMed

    Henriques, B; Faria, S; Soares, D; Silva, F S

    2013-01-01

    The purpose of this study was to evaluate the effect of hot pressing on the shear bond strength of a CoCrMoSi alloy to a low-fusing feldspathic porcelain, for two types of surface treatments: polished and grit-blasted. Moreover, the shear strength of hot pressed porcelain was also compared with that of conventional vacuum sintered porcelain. Bond strength of metal-porcelain composites were assessed by the means of a shear test performed in a universal test machine until fracture. Fracture surfaces and interfaces were investigated by optical microscope, stereomicroscope and SEM/EDS. Data was analyzed with Shapiro-Wilk test to test the assumption of normality. The 2-way ANOVA followed by Tukey HSD multiple comparison test was used to compare shear bond strength results and the t-test was used to compare the porcelain shear strength (p<0.05). Hot pressed specimens exhibited significantly (p<0.001) higher bond strength values than those obtained by conventional PFM technique. Significant differences (p<0.001) were found in the shear bond strength between grit-blasted and polished specimens. Significant differences (p<0.05) were also found between the shear strength of vacuum sintered and hot pressed porcelain. This study revealed that metal-ceramic bond strength is maximized for hot pressed porcelain onto rough metal substrates, with lower variability in results. Hot pressing technique was also shown to enhance the cohesion of porcelain.

  5. Hot pressing effect on the shear bond strength of dental porcelain to CoCrMoSi alloy substrates with different surface treatments.

    PubMed

    Henriques, B; Faria, S; Soares, D; Silva, F S

    2013-01-01

    The purpose of this study was to evaluate the effect of hot pressing on the shear bond strength of a CoCrMoSi alloy to a low-fusing feldspathic porcelain, for two types of surface treatments: polished and grit-blasted. Moreover, the shear strength of hot pressed porcelain was also compared with that of conventional vacuum sintered porcelain. Bond strength of metal-porcelain composites were assessed by the means of a shear test performed in a universal test machine until fracture. Fracture surfaces and interfaces were investigated by optical microscope, stereomicroscope and SEM/EDS. Data was analyzed with Shapiro-Wilk test to test the assumption of normality. The 2-way ANOVA followed by Tukey HSD multiple comparison test was used to compare shear bond strength results and the t-test was used to compare the porcelain shear strength (p<0.05). Hot pressed specimens exhibited significantly (p<0.001) higher bond strength values than those obtained by conventional PFM technique. Significant differences (p<0.001) were found in the shear bond strength between grit-blasted and polished specimens. Significant differences (p<0.05) were also found between the shear strength of vacuum sintered and hot pressed porcelain. This study revealed that metal-ceramic bond strength is maximized for hot pressed porcelain onto rough metal substrates, with lower variability in results. Hot pressing technique was also shown to enhance the cohesion of porcelain. PMID:25428110

  6. A point-focusing small angle x-ray scattering camera using a doubly curved monochromator of a W/Si multilayer

    NASA Astrophysics Data System (ADS)

    Sasanuma, Yuji; Law, Robert V.; Kobayashi, Yuji

    1996-03-01

    A point-focusing small angle x-ray scattering (SAXS) camera using a doubly curved monochromator of a W/Si multilayer has been designed, constructed, and tested. The two radii of curvature of the monochromator are 20 400 and 7.6 mm. The reflectivity of its first-order Bragg reflection for CuKα radiation was calculated to be 0.82, being comparable to that (0.81) of its total reflection. By only 10 s x-ray exposure, scattering from a high-density polyethylene film was detected on an imaging plate (IP). A rotating-anode x-ray generator operated at 40 kV and 30 mA was used. Diffraction from rat-tail collagen has shown that the optical arrangement gives the Bragg spacing up to, at least, 30 nm for CuKα radiation. Combined with IPs, the camera may permit us to carry out time-resolved SAXS measurements for phase behaviors of liquid crystals, lipids, polymer alloys, etc., on conventional x-ray generators available in laboratories.

  7. Creep Behaviour and Fracture Analysis of MoSi2 Based Composites

    NASA Astrophysics Data System (ADS)

    Ballóková, Beáta; Besterci, Michal; Hvizdoš, Pavol

    2015-07-01

    Molybdenum disilicide based composites containing different types of additive materials such as SiC and nano SiC particles have been investigated, based on the detailed examination of their microstructures and fracture surfaces after creep. The materials were prepared via powder metallurgy using high temperature controlled reaction sintering (CRS). The creep experiments were carried out in four-point bending mode in air in the temperature range from 1273 to 1673 K, with constant stress of 100 MPa. The creep behaviour and the mechanisms of damage were investigated on fracture surfaces by SEM and the microstructure and its response to high temperature load were investigated by TEM using the thin foil technique.

  8. Pest resistant MoSi.sub.2 materials and method of making

    NASA Technical Reports Server (NTRS)

    Hebsur, Mohan G. (Inventor)

    1995-01-01

    A pest resistant molybdenum disilicide composition is provided for use in high temperature structural applications. The composition includes molybdenum disilicide and silicon nitride and can be used to prepare improved reinforced composites.

  9. Nano-optical single-photon response mapping of waveguide integrated molybdenum silicide (MoSi) superconducting nanowires.

    PubMed

    Li, Jian; Kirkwood, Robert A; Baker, Luke J; Bosworth, David; Erotokritou, Kleanthis; Banerjee, Archan; Heath, Robert M; Natarajan, Chandra M; Barber, Zoe H; Sorel, Marc; Hadfield, Robert H

    2016-06-27

    We present low temperature nano-optical characterization of a silicon-on-insulator (SOI) waveguide integrated SNSPD. The SNSPD is fabricated from an amorphous Mo83Si17 thin film chosen to give excellent substrate conformity. At 350 mK, the SNSPD exhibits a uniform photoresponse under perpendicular illumination, corresponding to a maximum system detection efficiency of approximately 5% at 1550 nm wavelength. Under these conditions 10 Hz dark count rate and 51 ps full width at half maximum (FWHM) timing jitter is observed. PMID:27410555

  10. Study on the lifetime of Mo/Si multilayer optics with pulsed EUV-source at the ETS

    NASA Astrophysics Data System (ADS)

    Schürmann, Mark; Yulin, Sergiy; Nesterenko, Viatcheslav; Feigl, Torsten; Kaiser, Norbert; Tkachenko, Boris; Schürmann, Max C.

    2011-06-01

    As EUV lithography is on its way into production stage, studies of optics contamination and cleaning under realistic conditions become more and more important. Due to this fact an Exposure Test Stand (ETS) has been constructed at XTREME technologies GmbH in collaboration with Fraunhofer IOF and with financial support of Intel Corporation. This test stand is equipped with a pulsed DPP source and allows for the simultaneous exposure of several samples. In the standard set-up four samples with an exposed area larger than 35 mm2 per sample can be exposed at a homogeneous intensity of 0.25 mW/mm2. A recent update of the ETS allows for simultaneous exposures of two samples with intensities up to 1.0 mW/mm2. The first application of this alternative set-up was a comparative study of carbon contamination rates induced by EUV radiation from the pulsed source with contamination rates induced by quasicontinuous synchrotron radiation. A modified gas-inlet system allows for the introduction of a second gas to the exposure chamber. This possibility was applied to investigate the efficiency of EUV-induced cleaning with different gas mixtures. In particular the enhancement of EUV-induced cleaning by addition of a second gas to the cleaning gas was studied.

  11. Investigation of Shock-Induced Chemical Reactions in Mo-Si Powder Mixtures Using Instrumented Experiments with PVDF Stress Gauges

    SciTech Connect

    Vandersall, K S; Thadhani, N N

    2001-05-29

    Shock-induced chemical reactions in {approx}58% dense Mo+2Si powder mixtures were investigated using time-resolved instrumented experiments, employing PVDF-piezoelectric stress gauges placed at the front and rear surfaces of the powders to measure the input and propagated stresses, and wave speed through the powder mixture. Experiments performed on the powders at input stresses less than 4 GPa, showed characteristics of powder densification and dispersed propagated wave stress profiles with rise time > {approx}40 nanoseconds. At input stress between 4-6 GPa, the powder mixtures showed a sharp rise time (<{approx}10 ns) of propagated wave profile and an expanded state of products revealing evidence of shock-induced chemical reaction. At input stresses greater than 6 GPa, the powder mixtures showed a slower propagated-stress-wave rise time and transition to a low-compressibility (melt) state indicating lack of shock-induced reaction. The results illustrate that premature melting of Si, at input stresses less than the crush-strength of the powder mixtures, restricts mixing between reactants and inhibits ''shock-induced'' reaction initiation.

  12. Radiation tests of ITER diagnostic system materials in the BOR-60 reactor

    NASA Astrophysics Data System (ADS)

    Revyakin, Yu. L.; Kosenkov, V. M.; Bender, S. E.; Belyakov, V. A.

    1996-10-01

    An in-pile experiment was conducted up to a fluence of 9.9 × 10 25 m 2 ( E ≫ 0.1 MeV) which investigated the following electrophysical characteristics of a cable with mineral insulation and nickel conductor: insulation resistance, radiation-induced current and EMF. Irradiation was also performed in the BOR-60 reactor up to a fluence 10 23 m -2 on six crystal types for the monochromator: mica, LiF, multilayered mirrors Fe/C, W/Si, Cr/C and Mo/Si. Change of the reflectivity, width and shape of diffraction reflections were investigated.

  13. Annealing studies of amorphous alloys

    SciTech Connect

    Wiley, J.D.; Perepezko, J.H.; Nordman, J.E.

    1983-04-01

    Amorphous films of the alloys Ni-Nb, Ni-Mo, Mo-Si, and W-Si were sputter deposited on single-crystal semiconductor substrates. One-hour crystallization temperatures of the films were determined to within +-25/sup 0/C by annealing and x-ray diffraction measurements. Interdiffusion between Au or Cu overlayers and the amorphous films were studied by annealing combined with Auger Electron Spectroscopy (AES) profiling, and by Rutherford Backscatter (RBS) analysis. Supplementary measurements used to study structural relaxation and crystallization included resistivity as a function of temperature; DTA and DSC; and electron microscopy.

  14. Comparison of the Thermal Expansion Behavior of Several Intermetallic Silicide Alloys Between 293 and 1523 K

    NASA Technical Reports Server (NTRS)

    Raj, Sai V.

    2014-01-01

    Thermal expansion measurements were conducted on hot-pressed CrSi(sub 2), TiSi(sub 2), W Si(sub 2) and a two-phase Cr-Mo-Si intermetallic alloy between 293 and 1523 K during three heat-cool cycles. The corrected thermal expansion, (L/L(sub 0)(sub thermal), varied with the absolute temperature, T, as (deltaL/L(sub 0)(sub thermal) = A(T-293)(sup 3) + B(T-293)(sup 2) + C(T-293) + D, where A, B, C and D are regression constants. Excellent reproducibility was observed for most of the materials after the first heat-up cycle. In some cases, the data from the first heatup cycle deviated from those determined in the subsequent cycles. This deviation was attributed to the presence of residual stresses developed during processing, which are relieved after the first heat-up cycle.

  15. Numerical simulation on the thermal radiative properties of a 2D SiO2/W/SiO2/W layered grating for thermophotovoltaic applications

    NASA Astrophysics Data System (ADS)

    Zhao, Yi; Fu, Ceji

    2016-10-01

    Tailoring the spectrum of thermal emission from the emitter is important for improving the performance of a thermophotovoltaic (TPV) system. In this work, a two-dimensional (2D) layered grating structure made of SiO2 and tungsten (W), which can realize wavelength-selective control of thermal emission, was proposed for a potential emitter in TPV applications. Numerical simulations of the spectral emissivity of the structure from the ultraviolet (UV) to the mid-infrared region reveals that the spectral-normal emissivity of the structure is enhanced to above 0.95 in the wavelength region from 0.55 μm to 1.9 μm for both TE and TM waves, but drops sharply at wavelength larger than 2 μm. Physical mechanisms responsible for the wavelength-selective emissivity were elucidated as due to resonance of magnetic polaritons (MPs) in the SiO2 spacer and in the grooves of the tungsten grating, Wood's anomaly (WA), excitation of surface plasmon polaritons (SPPs) and wave interference. Furthermore, the structure was found to exhibit quasi-diffuse and polarization-insensitive features of thermal emission, suggesting that the proposed structure can serve as the emitter in the design of high performance TPV systems.

  16. Conceptual design study of concentrator enhanced solar arrays for space applications. 2kW Si and GaAs systems at 1 AU

    NASA Technical Reports Server (NTRS)

    1980-01-01

    The effect of concentration level on the specific power for a deployable, thin, gallium arsenide cell array in geosynchronous orbit for 10 years in conjunction with a two dimensional flat plate trough concentrator (V trough) and also with a multiple flat plate concentrator was investigated as well as the effects for a conventional silicon cell array on a rigid substrate. For application to a thin GaAs array at 1 AU for 10 years, the V trough produces a 19% benefit in specific power and a dramatic reduction in array area, while the multiple flat plate collector design is not only of no benefit, but is a considerable detriment. The benefit it achieves by reducing array area is duplicated by the 2D design. For the silicon array on a rigid substrate, improvement in performance due to a concentrator with ordinary mirror coating is quite small: 9% increase in specific power, and 13% reduction in array area. When the concentrator mirrors are coated with an improved cold mirror coating, somewhat more significant results are obtained: 31% specific power improvement; and 27% area reduction. In both cases, a 10 year exposure reduces BOL output by 23%.

  17. A 10-kW SiC Inverter with A Novel Printed Metal Power Module With Integrated Cooling Using Additive Manufacturing

    SciTech Connect

    Chinthavali, Madhu Sudhan; Ayers, Curtis William; Campbell, Steven L; Wiles, Randy H; Ozpineci, Burak

    2014-01-01

    With efforts to reduce the cost, size, and thermal management systems for the power electronics drivetrain in hybrid electric vehicles (HEVs) and plug-in hybrid electric vehicles (PHEVs), wide band gap semiconductors including silicon carbide (SiC) have been identified as possibly being a partial solution. This paper focuses on the development of a 10-kW all SiC inverter using a high power density, integrated printed metal power module with integrated cooling using additive manufacturing techniques. This is the first ever heat sink printed for a power electronics application. About 50% of the inverter was built using additive manufacturing techniques.

  18. Multilevel and long retentive resistive switching in low temperature nanostructured Cu/SiO{sub x}-W-SiO{sub x}/Pt

    SciTech Connect

    Wang, Jinzhi Wang, Fang; Hu, Guoqi; Liu, Xianglian; Chi, Zhenhua; Chen, Renjie; Yan, Aru; Li, Runwei

    2013-11-18

    Amorphous SiO{sub x}-based memory films are fabricated at room temperature, and study on their resistive switching characteristics and improvement approaches is performed. Multilevel resistive states with large ratio 1: ∼10{sup 2}: 3 × 10{sup 5} and long retention exceeding 2 × 10{sup 6} s at ambient temperature and humidity are observed in Cu/SiO{sub x} (9 nm)-W (∼2 nm)-SiO{sub x} (9 nm)/Pt ultrathin stack. Nonvolatile switching is consistently realized in microscopy. Based on investigations of microscopic conduction and microstructure, tungsten incorporation with copper as relay bridges for conducting filaments is proposed to attribute to the performance improvement and the multilevel switching mechanism.

  19. Performance of Multilayer Monochromators for Hard X-Ray Imaging with Coherent Synchrotron Radiation

    SciTech Connect

    Dietsch, R.; Holz, T.; Kraemer, M.; Weissbach, D.; Rack, A.; Weitkamp, T.; Morawe, Ch.; Cloetens, P.; Ziegler, E.; Riotte, M.; Rack, T.; Siewert, F.

    2011-09-09

    We present a study in which multilayers of different periodicity (from 2.5 to 5.5 nm), composition (W/Si, Mo/Si, Pd/B{sub 4}C, Ru/B{sub 4}C), and numbers of layers have been compared. Particularly, we chose mirrors with similar intrinsic quality (roughness and reflectivity) to study their performance (flatness and coherence of the outgoing beam) as monochromators in synchrotron radiography. The results indicate that material composition is the dominating factor for the performance. This is important to consider for future developments in synchrotron-based hard x-ray imaging methods. In these techniques, multilayer monochromators are popular because of their good tradeoff between spectral bandwidth and photon flux density of the outgoing beam, but sufficient homogeneity and preservation of the coherent properties of the reflected beam are major concerns. The experimental results we collected may help scientists and engineers specify multilayer monochromators and can contribute to better exploitation of the advantages of multilayer monochromators in microtomography and other full-field imaging techniques.

  20. Novel CD control of HTPSM by advanced process for sub-20nm tech

    NASA Astrophysics Data System (ADS)

    Jo, Sangjin; Choi, Chungseon; Oh, Sunghyun; Ha, Taejoong; Lee, Youngmo; Kim, Sangpyo; Yim, Donggyu

    2015-10-01

    As the design rule of the semiconductor shrinks, the CD MTT (Critical Dimension Mean-to-Target) specification for photomask becomes tighter. So, more precise control of CD MTT is required. We have investigated the CD MTT control and applied it to the attenuated PSM (Phase Shift Mask) successfully for several years. We can control the CD MTT of MoSi pattern by measuring Cr/MoSi pattern to estimate MoSi pattern CD and additional etch to shrink MoSi pattern as reported in previous study. At first, the MoSi pattern CD can be estimated with the Cr/MoSi pattern CD because the CD gap between MoSi pattern and Cr/MoSi pattern is relatively constant. Additional MoSi etch is performed to shrink the MoSi pattern CD after then. The CD gap alwasys exists and the variation of the CD gap is enough small to be not considered in conventional photomask production until now. However, the variation of the CD gap is not ignorable in case of sub-20 nm tech. In this study, we investigated new method to measure MoSi pattern CD before Cr strip process to eliminate the CD gap between MoSi pattern and Cr/MoSi pattern. To eliminate the CD gap, we attempt three solutions - 1) Optimize etch process to perform perfect Cr/MoSi pattern profile without the CD gap, 2) Improve CD measurement accuracy by developing new SEM measuring mechanism, 3) Develop of new process to modify Cr/MoSi pattern profile to be measured without the CD gap. It was found that the CD gap can be eliminated and MoSi pattern CD can be measured perfectly. Finally, MoSi pattern CD control was improved because of CD gap elimination.

  1. MOLYBDENUM DISILICIDE MATERIALS FOR GLASS MELTING SENSOR SHEATHS

    SciTech Connect

    J. PETROVIC; R. CASTRO; ET AL

    2001-01-01

    Sensors for measuring the properties of molten glass require protective sensor sheaths in order to shield them from the extremely corrosive molten glass environment. MoSi{sub 2} has been shown to possess excellent corrosion resistance in molten glass, making it a candidate material for advanced sensor sheath applications. MoSi{sub 2}-coated Al{sub 2}O{sub 3} tubes, MoSi{sub 2}-Al{sub 2}O{sub 3} laminate composite tubes, and MoSi{sub 2}-Al{sub 2}O{sub 3} functionally graded composite tubes have been produced by plasma spray-forming techniques for such applications.

  2. High temperature structural silicides

    SciTech Connect

    Petrovic, J.J.

    1997-03-01

    Structural silicides have important high temperature applications in oxidizing and aggressive environments. Most prominent are MoSi{sub 2}-based materials, which are borderline ceramic-intermetallic compounds. MoSi{sub 2} single crystals exhibit macroscopic compressive ductility at temperatures below room temperature in some orientations. Polycrystalline MoSi{sub 2} possesses elevated temperature creep behavior which is highly sensitive to grain size. MoSi{sub 2}-Si{sub 3}N{sub 4} composites show an important combination of oxidation resistance, creep resistance, and low temperature fracture toughness. Current potential applications of MoSi{sub 2}-based materials include furnace heating elements, molten metal lances, industrial gas burners, aerospace turbine engine components, diesel engine glow plugs, and materials for glass processing.

  3. Microstructure Characteristics and Oxidation Behavior of Molybdenum Disilicide Coatings Prepared by Vacuum Plasma Spraying

    NASA Astrophysics Data System (ADS)

    Niu, Yaran; Fei, Xiaoai; Wang, Hongyan; Zheng, Xuebin; Ding, Chuanxian

    2013-03-01

    In this study, molybdenum disilicide (MoSi2) coatings were fabricated by vacuum plasma spraying technology. Their morphology, composition, and microstructure characteristics were intensively investigated. The oxidation behavior of MoSi2 coatings was also explored. The results show that the MoSi2 coatings are compact with porosity less than 5%. Their microstructure exhibits typical lamellar character and is mainly composed of tetragonal and hexagonal MoSi2 phases. A small amount of tetragonal Mo5Si3 phase is randomly distributed in the MoSi2 matrix. A rapid weight gain is found between 300 and 800 °C. The MoSi2 coatings exhibit excellent oxidation-resistant properties at temperatures between 1300 and 1500 °C, which results from the continuous dense glassy SiO2 film formed on their surface. A thick layer composed of Mo5Si3 is found to be present under the SiO2 film for the MoSi2 coatings treated at 1700 °C, suggesting that the phenomenon of continuous oxidation took place.

  4. Effects of Ti, Zr, and Hf on the Phase Stability of Mo-Mo3Si+Mo5SiB2 Alloys at 1600 C

    SciTech Connect

    Yang, Ying; Bei, Hongbin; Chen, Shuanglin; George, Easo P; Tiley, Jaimie; Chang, Y. Austin

    2010-01-01

    Understanding the stability of the three-phase Mo{_}+Mo{sub 3}Si+Mo{sub 5}SiB{sub 2} region is important for alloy design of Mo-Si-B-based refractory metal intermetallic composites. In this work, thermodynamic modeling is coupled with guided experiments to study phase stability in this three-phase region of the Mo-Si-B-X (X = Ti, Zr, Hf) system. Both the calculated and experimental results show that additions of Zr and Hf limit significantly the stability of the three-phase region because of the formation of the ternary phases MoSiZr and MoSiHf, while Ti addition leads to a much larger region of stability for the three-phase equilibrium.

  5. Chemical Reactions in the Processing of Mosi2 + Carbon Compacts

    NASA Technical Reports Server (NTRS)

    Jacobson, Nathan S.; Lee, Kang N.; Maloy, Stuart A.; Heuer, Arthur H.

    1993-01-01

    Hot-pressing of MoSi2 powders with carbon at high temperatures reduces the siliceous grain boundary phase in the resultant compact. The chemical reactions in this process were examined using the Knudsen cell technique. A 2.3 wt pct oxygen MoSi2 powder and a 0.59 wt pct oxygen MoSi2 powder, both with additions of 2 wt pct carbon, were examined. The reduction of the siliceous grain boundary phase was examined at 1350 K and the resultant P(SiO)/P(CO) ratios interpreted in terms of the SiO(g) and CO(g) isobars on the Si-C-O predominance diagram. The MoSi2 + carbon mixtures were then heated at the hot-pressing temperature of 2100 K. Large weight losses were observed and could be correlated with the formation of a low-melting eutectic and the formation and vaporization of SiC.

  6. High temperature stability multilayers for EUV condenser optics

    SciTech Connect

    Bajt, S; Stearns, D G

    2005-05-03

    We investigate the thermal stability of Mo/SiC multilayer coatings at elevated temperatures. Transmission electron microscopy and x-ray diffraction studies show that upon annealing a thermally-induced structural relaxation occurs that transforms the polycrystalline Mo and amorphous SiC layers in as-deposited multilayers into amorphous Mo-Si-C alloy and crystalline SiC, respectively. After this relaxation process is complete the multilayer is stable at temperatures up to 400 C.

  7. MECHANICAL BEHAVIOR OF MOLYBDENUM DISILICIDE-BASED ALLOYS

    SciTech Connect

    A. MISRA; A. SHARIF; ET AL

    2000-12-01

    We have investigated the mechanical behavior of the following single-phase polycrystalline alloys with the MoSi{sub 2} body-center tetragonal structure: MoSi{sub 2} alloyed with {approximately}2.5 at.% Re, MoSi{sub 2} alloyed with 2 at.% Al, MoSi{sub 2} alloyed with 1 at.% Nb, and MoSi{sub 2} alloyed with 1 at.% Re and 2 at.% Al. Several anomalies in the mechanical behavior of alloyed materials were observed. For example, (1) addition of only {approximately}2.5 at. % Re results in an order of magnitude increase in compressive strength at 1600 C, (2) additions of Nb and Al cause solution softening at near-ambient temperatures, and (3) quaternary MoSi{sub 2}-Re-Al alloys show strengthening at elevated temperatures and reduction in flow stress with enhanced plasticity at near-ambient temperatures in compression. The mechanisms of anomalous solution hardening and softening are discussed.

  8. Combustion synthesis of molybdenum silicides and borosilicides for ultrahigh-temperature structural applications

    NASA Astrophysics Data System (ADS)

    Alam, Mohammad Shafiul

    Molybdenum silicides and borosilicides are promising structural materials for gas-turbine power plants. A major challenge, however, is to simultaneously achieve high oxidation resistance and acceptable mechanical properties at high temperatures. For example, molybdenum disilicide (MoSi2) has excellent oxidation resistance and poor mechanical properties, while Mo-rich silicides such as Mo5Si3 (called T 1) have much better mechanical properties but poor oxidation resistance. One approach is based on the fabrication of MoSi2-T 1 composites that combine high oxidation resistance of MoSi2 and good mechanical properties of T1. Another approach involves the addition of boron to Mo-rich silicides for improving their oxidation resistance through the formation of a borosilicate surface layer. In particular, Mo 5SiB2 (called T2) phase is considered as an attractive material. In the thesis, MoSi2-T1 composites and materials based on T2 phase are obtained by mechanically activated SHS. Use of SHS compaction (quasi-isostatic pressing) significantly improves oxidation resistance of the obtained MoSi2-T1 composites. Combustion of Mo-Si-B mixtures for the formation of T2 phase becomes possible if the composition is designed for the addition of more exothermic reactions leading to the formation of molybdenum boride. These mixtures exhibit spin combustion, the characteristics of which are in good agreement with the spin combustion theory. Oxidation resistance of the obtained Mo-Si-B materials is independent on the concentration of Mo phase in the products so that the materials with a higher Mo content are preferable because of better mechanical properties. Also, T2 phase has been obtained by the chemical oven combustion synthesis technique.

  9. Development of high-transmittance phase-shifting mask for ArF immersion lithography

    NASA Astrophysics Data System (ADS)

    Ahn, Won-suk; Seo, Hwan-Seok; Bang, Ju-Mi; Kim, Ji-Young; Song, Jae-Min; Seung, Byoung-Hoon; Kim, Hee-Bom; Jeon, Chan-Uk

    2015-07-01

    A new PSM using high transmittance is developed to overcome patterning process limits in ArF immersion lithography. We optimized mask structure, materials, and film thicknesses for patterning process. A new material for phase-shifter is applied to the HT-PSM to exhibit higher transmittance in ArF wavelengths and the thickness of the new material is thinner than that of the conventional 6% phase-shifter (MoSiON). A new blank structure using a MoSi shading layer with double Cr hardmasks (HM) is developed and suggested for the HTPSM process. Double HM blank stacks enable the HT-PSM to adopt thin PR process for resolution enhancement in mask process. The first Cr on the MoSi is utilized as a HM to etch MoSi shading layer, an adhesion layer for PR process, and also a capping layer to protect blind area during MoSi and phase-shifter etching. In contrast, the role of the second Cr between MoSi and phase-shifter is an etch stopper for MoSi and a HM to etch phase-shifter at the same time. However, Double HM process has some problems, such as first Cr removal during second Cr etching and complex process steps. To solve the Cr removal issues, we evaluated various Cr layers which have different etchrates and compositions. According to the evaluations, we optimized thicknesses and compositions of the two Cr layers and corresponding etching conditions. Lithography simulations demonstrate that the new HT-PSM has advantages in NILS in aerial images. As a result, initial wafer exposure experiments using the HT-PSM show 13-32% improvements in LCDU compared to that of the conventional 6% PSM due to its higher NILS.

  10. Processing of transition metal silicides for high-temperature applications

    SciTech Connect

    Deevi, S.C.; Sikka, V.K.

    1995-12-31

    The authors review and discuss recent developments in the processing and mechanical properties of MoSi{sub 2} and its composites. High-temperature creep rates of MoSi{sub 2} and its composites are compared to those of several intermetallics and discussed in relation to grain-size effects. Thermophysical properties of MoSi{sub 2} and Si{sub 3}N{sub 4} are compared, and the need for functionally graded composites of MoSi{sub 2}-Si{sub 3}N{sub 4} is discussed. This is followed by a discussion of combustion synthesis, reaction synthesis and densification, in-situ composite development, and reactive hot extrusion of metal-silicon mixtures. In combustion synthesis, a heterogeneous reaction occurs between liquid Si and Mo powder to form MoSi{sub 2}. This technique can be applied to obtain composites and alloys of MoSi{sub 2} and various other transition-metal silicides. In-situ synthesis of a composite of MoSi{sub 2}-Al{sub 2}O{sub 3} was carried out by reacting a thermite mixture consisting of MoO{sub 3}, Al, and Si powders. X-ray characterization of the products obtained at various temperatures reveals that the mechanism consists of a reduction of MoO{sub 3} by Al to MoO{sub 2}, followed by a simultaneous oxidation of Al to Al{sub 2}O{sub 3} and a synthesis reaction between reduced Mo and Si to form MoSi{sub 2}. The rate-determining step is found to be reduction of MoO{sub 2} by Al and oxidation of Al to Al{sub 2}O{sub 3}. The thermite reaction was moderated by adding Mo and Si to the mixture of MoO{sub 3}, Al, and Si, such that the ratio of MoSi{sub 2} to the thermite was in the range of 60:40 to 90:10. Reactive extrusion of metal-silicon mixtures of 3Ni-Si and Co-2Si results in a dense product with at least two phases.

  11. Synthesis and design of silicide intermetallic materials

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.

    1997-04-01

    The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the U.S. processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive U.S. processing industries. The program presently has a number of developing industrial connections, including a CRADA with Schuller International Inc. targeted at the area of MoSi{sub 2}-based high temperature materials and components for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. Current experimental emphasis is on the development and characterization of MoSi{sub 2}-Si{sub 3}N{sub 4} and MoSi{sub 2}-SiC composites, the plasma spraying of MoSi{sub 2}-based materials, and the joining of MoSi{sub 2} materials to metals.

  12. The analysis and minimization of oxygen contamination in the powder processing of molybdenum disilicide

    SciTech Connect

    Shannon, K.

    1994-04-24

    Problems with MoSi{sub 2} include low-temperature fracture toughness, high-temperature creep resistance, and ``pest`` phenomena. Oxygen introduced by powder processing may be the cause of some of these problems. This study led to the following conclusions: Supplied powders have significant oxygen present prior to processing (up to 2.5 %), in the form of silica on the surface. This oxygen contamination did not increase by exposure to air at room temperature. An improved powder processing method was developed that uses glass encapsulation. Analysis of microstructures created from powders that contained 4900 to 24,100 ppM oxygen showed that the silica was transferred to the fully dense MoSi{sub 2} as SiO{sub 2} inclusions. A method of producing MoSi{sub 2} with less oxygen was attempted.

  13. [Multilayer mirrors used for the moon-based EUV imager].

    PubMed

    Liu, Zhen; Gao, Jin-Song; Chen, Bo; Wang, Tong-Tong; Wang, Xiao-Yi; Shen, Zhen-Feng; Chen, Hong

    2013-01-01

    The EUV imager is used to observe the 30.4 nm radiation of the earth's plasmasphere on the lunar surface. The 30.4 nm multilayer is the key optical part of the imager. According to the technical parameters, the B4 C/Mg, B4 C/Mg2Si, B4 C/Al, B4 C/Si, Mo/Si and so on were chosen. The period thickness, ratio of the material and the number of the periods were optimized and the reflectivity of those multilayers were calculated. In consideration of the lunar environment, the Mo/Si and the B4 C/Si multilayer were deposited by magnetron sputtering coating plant. The reflectivity of Mo/Si and B4 C/Si multilayer at 30.4 nm is 15.3% and 22.8% respectively. PMID:23586274

  14. Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns

    DOEpatents

    Hau-Riege, Stefan Peter

    2007-05-01

    The invention applies techniques for image reconstruction from X-ray diffraction patterns on the three-dimensional imaging of defects in EUVL multilayer films. The reconstructed image gives information about the out-of-plane position and the diffraction strength of the defect. The positional information can be used to select the correct defect repair technique. This invention enables the fabrication of defect-free (since repaired) X-ray Mo--Si multilayer mirrors. Repairing Mo--Si multilayer-film defects on mask blanks is a key for the commercial success of EUVL. It is known that particles are added to the Mo--Si multilayer film during the fabrication process. There is a large effort to reduce this contamination, but results are not sufficient, and defects continue to be a major mask yield limiter. All suggested repair strategies need to know the out-of-plane position of the defects in the multilayer.

  15. Effects of dispersion and filtering induced by periodic multilayer mirrors reflection on attosecond pulses

    NASA Astrophysics Data System (ADS)

    Lin, Cheng-You; Yin, Liang; Chen, Shu-Jing; Chen, Zhao-Yang; Ding, Ying-Chun

    2016-09-01

    Using temporal and spectral methods, the effects of dispersion and filtering induced by Mo/Si multilayer mirrors reflection on incident attosecond pulses were studied. First, two temporal parameters, the pulse broadening factor, and the energy loss factor, were defined to evaluate the effects of dispersion and filtering. Then, by analyzing these temporal parameters, we investigated and compared the dispersion and filtering effects on attosecond pulses. In addition, we explored the origins of pulse broadening and energy loss by analyzing the spectral and temporal characteristics of periodic Mo/Si multilayer mirrors. The results indicate that the filtering effect induced by Mo/Si multilayer mirrors reflection is the dominant reason for pulse broadening and energy loss. Project supported by the National Natural Science Foundation of China (Grant Nos. 11547183 and 11547241) and the Fundamental Research Funds for Central Universities, China (Grant Nos. JD1517 and 2652014012).

  16. Synthesis and design of intermetallic materials - molybdenum disilicide

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.

    1995-05-01

    The objective of this program is to develop structural silicide-based composite materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation resistance for applications of importance to the U.S. processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature composite materials and important applications in major energy-intensive U.S. processing industries. The program presently has a number of developing industrial connections, including a CRADA with the advanced materials company Advanced Refractory Technologies Inc. and interactions targeted at developing industrial gas burner and metal and glass melting/processing applications. Current experimental emphasis is on the development and characterization of SiC reinforced-MoSi{sub 2} matrix composites, plasma sprayed MoSi{sub 2}-based materials and microlaminate composites, and MoSi{sub 2} reinforced-Si{sub 3}N{sub 4} matrix composites. We are developing processing methods for MoSi{sub 2{minus}}based materials and microlaminate composites, and MoSi{sub 2} reinforced-Si{sub 3}N{sub 4} matrix composites. We are developing processing methods for MoSi{sub 2{minus}} based materials, such as plasma spraying/spray forming and electrophoretic deposition. We are also pursuing the fabrication of prototype industrial gas burner and injection tube components of these materials, as well as prototype components for glass processing.

  17. Silicon-nitride and metal composite

    DOEpatents

    Landingham, Richard L.; Huffsmith, Sarah A.

    1981-01-01

    A composite and a method for bonding the composite. The composite includes a ceramic portion of silicon nitride, a refractory metal portion and a layer of MoSi.sub.2 indirectly bonding the composite together. The method includes contacting the layer of MoSi.sub.2 with a surface of the silicon nitride and with a surface of the metal; heating the layer to a temperature below 1400.degree. C.; and, simultaneously with the heating, compressing the layer such that the contacting is with a pressure of at least 30 MPa. This composite overcomes useful life problems in the fabrication of parts for a helical expander for use in power generation.

  18. Phenomenological study of the behavior of some silica formers in a high velocity jet fuel burner

    NASA Technical Reports Server (NTRS)

    Cawley, J. D.; Handschuh, R. F.

    1985-01-01

    Samples of four silica formers: single crystal SiC, sintered alpha-SiC, reaction sintered Si3N4 and polycrystalline MoSi2, were subjected to a Mach 1 jet fuel burner for 1 hr, at a sample temperature of 1375 deg C (2500 deg F). Two phenomena were identified which may be deleterious to a gas turbine application of these materials. The glass layer formed on the MoSi2 deformed appreciably under the aerodynamic load. A scale developed on the samples of the other materials which consisted of particular matter from the gas stream entrapped in a SiO2 matrix.

  19. Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces

    DOEpatents

    Malinowski, Michael E.

    2005-01-25

    The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.

  20. Silicon-nitride and metal composite

    DOEpatents

    Landingham, R.L.; Huffsmith, S.A.

    A composite and a method for bonding the composite are described. The composite includes a ceramic portion of silicon nitride, a refractory metal portion and a layer of MoSi/sub 2/ indirectly bonding the composite together. The method includes contacting the layer of MoSi/sub 2/ with a surface of the silicon nitride and with a surface of the metal; heating the layer to a temperature below 1400/sup 0/C; and, simultaneously, compressing the layer such that the contacting is with a pressure of at least 30 MPa. This composite overcomes useful life problems in the fabrication of parts for a helical expander for use in power generation.

  1. Thin film molybdenum silicide as potential temperature sensors for turbine engines

    NASA Technical Reports Server (NTRS)

    Ho, C. H.; Prakash, S.; Deshpandey, C. V.; Doerr, H. J.; Bunshah, R. F.

    1989-01-01

    Temperature measurements of Mo-Si-based thin-film resistance thermometers were studied. Annealing in an argon ambient at a temperature above 1000 C for at least 1 h is required to form the stable tetragonal MoSi2 phase. With a crack-free 2-micron-thick AlN barrier layer on top, a sensor was tested up to 1200 C. The resistivity vs temperature characteristic shows the room temperature resistivity and temperature coefficient of resistivity (TCR) of the sensor to be approximately 350 microohm and 0.01195 K, respectively. No film adhesion problems were observed for at least four testing cycles.

  2. Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

    DOEpatents

    Barbee, Jr., Troy W.; Bajt, Sasa

    2002-01-01

    The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

  3. Atomistic Potentials for the Molybdenum-Silicon System

    SciTech Connect

    M. I. Baskes

    1998-11-01

    Using a modified version of the Embedded Atom Method (EAM) that includes angular forces, potentials are developed for the Mo/Si system. Previously developed potentials for Mo and Si are used. The cross potential is fit to properties of MoSi2, Mo3Si, and Mo5Si3. Predictions are presented for phase stability, lattice constants, elastic constants, and point and planar defect energies. In general the agreement with experiment is good, but the predicted lattice constants are somewhat greater than experiment.

  4. Slurry and Plasma-spray Coating of Selective Emitting Rare-earth Oxides on High Temperature Resistant Substrates

    NASA Astrophysics Data System (ADS)

    Tobler, W. J.; Durisch, W.

    2007-02-01

    Selective emitting coatings of the rare-earth oxides Yb2O3 and Yb-doped garnet have been applied on SiC by slurry coating and on the high refractory intermetallic compound MoSi2 by vacuum plasma-spraying. The TPV emitters produced are fully operable in oxygen atmosphere at high temperatures > 1500 °C. The novel technique of pairing MoSi2 substrate with plasma-sprayed rare-earth oxide results in highly thermal shock stable emitters due to an ideal match of the thermal expansion coefficients of intermetallic compound and ceramics.

  5. Preserving EAPSM Phase and Transmission in the Clean Process

    NASA Astrophysics Data System (ADS)

    Choi, Se-Jong; Yoon, Si-Yeul; Kim, Yong-Dae; Lee, Hak-Weon; Kim, Dae-Hong; Lee, Si-Woo; Lee, Dong-Heok; Kim, Jin-Min; Choi, Sang-Soo; Jeong, Soo Hong

    2002-12-01

    The cleaning of embedded-attenuated phase shift masks (EAPSMs) is one of the most important enabling capabilities in the production of high-quality masks. Particles are commonly generated during Cr and MoSiON etching using inductively coupled plasma (ICP) tools. The cleaning process of EAPSMs requires not only the removal of particles on the phase shifting layer (MoSiON) and glass, but also the ability to leave the phase and transmission properties intact. Megasonic cleaning is a technique commonly used for removing particles on the surfaces of photomasks. However, megasonic processes employing SC-1 chemistry (specifically ammonium hydroxide) cannot be applied to a MoSiON PSM. Chemical erosion of the alkali-soluble phase shifting layer will drive phase and transmission performance outside of customer specifications. Therefore, EAPSM cleaning must balance simultaneously the complete removal of particles with the prevention physical damage. For these reasons, the cleaning process requires a high degree of control. In this paper, a new cleaning method was applied to MoSiON-based masks utilizing megasonic cleaning because it had a little change on phase and transmission. Traditional SC-1 chemistry was not used at all. Results obtained through this method showed a little change on phase and transmission. The particles on glass also can be sufficiently removed using megasonic process with the dilute SC-1 chemistry. The cleaning technique for the fabrication of EAPSMs with no variation in phase and transmission after the cleaning process will be presented.

  6. Recovery of EUVL substrates

    SciTech Connect

    Vernon, S.P.; Baker, S.L.

    1995-01-19

    Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

  7. Porous acicular mullite obtained by controlled oxidation of waste molybdenum disilicide

    SciTech Connect

    Bučevac, Dušan; Dapčević, Aleksandra; Maksimović, Vesna

    2014-02-01

    Highlights: • Waste MoSi{sub 2} heating elements were used as starting material for fabrication of porous acicular mullite. • Calcined MoSi{sub 2} powder was source of SiO{sub 2} and pore former at the same time. • Porous acicular mullite is promising material for filtration of diesel engine exhaust. • Samples with decent mechanical integrity and porosity of more than 60% were fabricated. - Abstract: Porous acicular mullite was fabricated by using waste MoSi{sub 2} heating element and Al{sub 2}O{sub 3}. Careful calcination of the pulverized heating element led to the formation of a mixture of MoO{sub 3} and amorphous SiO{sub 2}. This mixture was employed as both SiO{sub 2} precursor and pore former. The oxidation of MoSi{sub 2} and mullite formation were studied. The effect of fabrication temperature on phase composition, porosity, grain morphology, and compressive strength of sintered mullite was examined. Pure mullite with porosity of more than 60% and compressive strength of ∼20 MPa was obtained at temperature as low as 1300 °C. The microstructure consisted of elongated, rectangular, prism-like grains which are known to be effective in filtration of diesel engine exhaust. The increase in sintering temperature caused the change of grain morphology and reduction in compressive strength.

  8. Silicide Coating Fabricated by HAPC/SAPS Combination to Protect Niobium Alloy from Oxidation.

    PubMed

    Sun, Jia; Fu, Qian-Gang; Guo, Li-Ping; Wang, Lu

    2016-06-22

    A combined silicide coating, including inner NbSi2 layer and outer MoSi2 layer, was fabricated through a two-step method. The NbSi2 was deposited on niobium alloy by halide activated pack cementation (HAPC) in the first step. Then, supersonic atmospheric plasma spray (SAPS) was applied to obtain the outer MoSi2 layer, forming a combined silicide coating. Results show that the combined coating possessed a compact structure. The phase constitution of the combined coating prepared by HAPC and SAPS was NbSi2 and MoSi2, respectively. The adhesion strength of the combined coating increased nearly two times than that for single sprayed coating, attributing to the rougher surface of the HAPC-bond layer whose roughness increased about three times than that of the grit-blast substrate. After exposure at 1200 °C in air, the mass increasing rate for single HAPC-silicide coating was 3.5 mg/cm(2) because of the pest oxidation of niobium alloy, whereas the combined coating displayed better oxidation resistance with a mass gain of only 1.2 mg/cm(2). Even more, the combined coating could significantly improve the antioxidation ability of niobium based alloy at 1500 °C. The good oxidation resistance of the combined silicide coating was attributed to the integrity of the combined coating and the continuous SiO2 protective scale provided by the oxidation of MoSi2.

  9. Development of Metallic Magnetic Calorimeters with a Critical Temperature Switch

    NASA Astrophysics Data System (ADS)

    Kim, S. R.; Choi, J.; Jo, H. S.; Kang, C. S.; Kim, G. B.; Kim, H. L.; Kim, I. W.; Lee, H. J.; Lee, J. H.; Lee, M. K.; Oh, S. Y.; Sala, E.; So, J. H.; Yoon, W. S.; Kim, Y. H.

    2016-07-01

    We report on the progress in the development of meander-shaped metallic magnetic calorimeters (MMCs) with a critical temperature switch. A niobium meander-shaped coil in an MMC is arranged to form a superconducting loop. It is to measure the change in magnetization and to apply a persistent current that magnetizes the MMC sensor material. In this work, part of the superconducting loop is fabricated with another superconducting material with its transition temperature (T_C) lower than that of niobium. A persistent current can be injected in the loop while reducing the temperature from above to below the T_C of the switch. Aluminum (Al) wires and an alloy of molybdenum and germanium (MoGe) were tested as critical temperature switch. The test with the Al switch demonstrated the temperature switch concept for meander-shaped MMCs that require a large field current. Microfabricated MoGe switches showed a T_C near 4.3 K, but only 7 mA of persistent current could be charged due to MoGe film discontinuity. This issue requires further improvement in the fabrication procedure.

  10. Phase identification in reactive sintering of molybdenum disilicide composites

    SciTech Connect

    Alba, J. Jr.

    1996-10-01

    Molybdenum disilicide has been predominantly used for furnace heating elements, but recently there has been interest in its use for high temperature structural applications. The reason for this increased interest stems from its desirable characteristics which are a high melting point, relatively low density, good oxidation resistance, relatively good thermal conductivity and electronically conductive. The melting point of MoSi{sub 2} is approximately 2030{degrees}C as compared to a melting point of 1340{degrees}C for the Ni-based superalloys. This could potentially give MoSi{sub 2} a big advantage over the Ni-based superalloys in turbine applications because the operating temperature can be increased resulting in an increase in turbine efficiency and reduced emissions. The relatively low density (6.25g/cm{sup 3}) compared to the Ni-based superalloys (8.9 g/cm{sup 3}) is an important advantage in turbine applications because of the need for low weight. Good oxidation resistance stems from the ability of MoSi{sub 2} to form a protective SiO{sub 2} surface layer when exposed to oxygen. Another advantageous feature of MoSi{sub 2} is its thermal conductivity which is superior to Ni-based superalloys at low temperatures and comparable to the Ni-based superalloys at high temperatures. This allows heat to be dissipated at a rate better than ceramics and comparable to metals. MoSi{sub 2} is electrically conductive allowing it to be electro discharge machined. This is desirable since conventional ceramics are not generally conductive and cannot be electro discharge machined.

  11. Raman study of phase transformation from diamond structure to wurtzite structure in the silicon nanowires

    NASA Astrophysics Data System (ADS)

    Shukla, A. K.; Dixit, Saurabh

    2016-07-01

    Hexagonal silicon has emerged as an exciting material due to its novel vibrational and electronic properties. Synthesis of the wurtzite silicon nanowires (w-SiNWs) is studied here using metal assisted chemical etching (MACE) technique. Stress induced in the SiNWs during wet chemical etching is attributed to formation of the w-SiNWs. Presence of the w-SiNWs is revealed by first-order and second-order Raman spectra. The effect of variation of deposition time of silver (catalyst) is explicitly studied for growth of w-SiNWs. The deposition time enhances the density of SiNWs in an island of vertically aligned SiNWs. Absorption coefficient studies of the w-SiNWs are also conducted using UV-vis spectroscopy as a function of deposition time. Increase in the absorption coefficient in SiNWs is noticed with increasing deposition time. The prominent quantum confinement along with stress and porosity is shown to be mainly responsible for the transformation from diamond structure to wurtzite structure in the silicon nanowires.

  12. X-ray photoelectron spectroscopy study of radiofrequency-sputtered refractory compound steel interfaces

    NASA Technical Reports Server (NTRS)

    Wheeler, D. R.; Brainard, W. A.

    1978-01-01

    Radiofrequency sputtering was used to deposit Mo2C, Mo2B5, and MoSi2 coatings on 440C steel substrates. Both sputter etched and preoxidized substrates were used, and the films were deposited with and without a substrate bias of -300 V. The composition of the coatings was measured as a function of depth by X-ray photoelectron spectroscopy combined with argon ion etching. In the interfacial region there was evidence that bias produced a graded interface in Mo2B5 but not in Mo2C. Oxides of iron and of all film constituents except carbon were presented in all cases but the iron oxide concentration was higher and the layer thicker on the preoxidized substrates. The film and iron oxides were mixed in the MoSi2 and Mo2C films but layered in the Mo2B5 film. The presence of mixed oxides correlates with enhanced film adhesion.

  13. Strength, fracture, and fatigue behavior of advanced high-temperature intermetallics reinforced with ductile phases

    SciTech Connect

    Soboyejo, W.O. ); Venkateswara Rao, K.T.; Ritchie, R.O. ); Sastry, S.M.L. )

    1993-03-01

    The results of recent studies on the fatigue and fracture behavior of extruded Ti-48Al + 20 vol pct TiNb and hot-isostatically pressed ('hipped') MoSi[sub 2] + 20 vol pct Nb are presented (compositions in atomic percent unless stated otherwise). The effects of ductile phase reinforcement of Ti-48Al and MoSi[sub 2] on the micromechanisms of fracture under monotonic and cyclic loading are elucidated. Micromechanics models are applied to the prediction of crack-tip shielding components, and the effects of temperature on tensile/compressive/flexure strengths are discussed. Ductile phase toughening under monotonic loading conditions is shown to be associated with lower fatigue crack growth resistance. The lower fatigue resistance is attributed to the absence of crack-tip shielding, higher crack opening displacements, and the effects of inelastic strains that are developed in ductile phase-reinforced composites under cyclic loading conditions.

  14. Diffraction-limited soft-x-ray projection imaging using a laser plasma source

    SciTech Connect

    Tichenor, D.A.; Kubiak, G.D.; Malinowski, M.E.; Stulen, R.H.; Haney, S.J.; Berger, K.W.; Brown, L.A. ); Freeman, R.R.; Mansfield, W.M.; Wood, O.R. II; Tennant, D.M.; Bjorkholm, J.E.; MacDowell, A.A. ); Bokor, J.; Jewell, T.E.; White, D.L.; Windt, D.L.; Waskiewicz, W.K. )

    1991-10-15

    Projection imaging of 0.1-{mu}m lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-{mu}m lines and spaces is observed in polymethylmethacrylate.

  15. Evaluation of mask repair strategies via focused electron, helium, and neon beam induced processing for EUV applications

    NASA Astrophysics Data System (ADS)

    Gonzalez, C. M.; Slingenbergh, W.; Timilsina, R.; Noh, J.-H.; Stanford, M. G.; Lewis, B. B.; Klein, K. L.; Liang, T.; Fowlkes, J. D.; Rack, P. D.

    2014-04-01

    One critical area for EUV lithography is the development of appropriate mask repair strategies. To this end, we have explored etching repair strategies for nickel absorber layers and focused electron beam induced deposition of ruthenium capping layers. Nickel has higher EUV absorption than the standard TaN absorber layer and thus thinner films and improved optical quality can be realized. A thin (2.5 nm) ruthenium film is commonly used as a protective capping layer on the Mo-Si EUV multi-layer mirror which mechanically and chemically protects the multi-layers during standard mask-making procedures. The gas field ion (GFIS) microscope was used to investigate helium and neon ion beam induced etching (IBIE) of nickel as a candidate technique for EUV lithography mask editing. No discernable nickel etching was observed for helium, however transmission electron microscopy (TEM) revealed subsurface damage to the underlying Mo-Si multilayers. Subsequently, neon beam induced etching at 30 keV was investigated and successfully removed the 50 nm nickel absorber film. TEM imaging also revealed subsurface damage in the underlying Mo-Si multilayer. Two damage regimes were apparent, namely: 1) beam induced mixing of the Mo-Si layers and 2) nanobubble formation. Monte Carlo simulations were performed and the observed damage regimes were correlated to: 1) the nuclear energy loss and 2) a critical implant concentration. Electron beam induced deposition (EBID) was explored to deposit ruthenium capping/protective layers. Several ruthenium precursors were screened and so far liquid bis(ethylcyclopentyldienyl)ruthenium(II) was successful. The purity of the as-deposited nanodeposits was estimated to be 10% Ru and 90% C. We demonstrate a new chemically assisted electron beam purification process to remove carbon by-products and show that high-fidelity nanoscale ruthenium repairs can be realized.

  16. In depth study of molybdenum silicon compound formation at buried interfaces

    NASA Astrophysics Data System (ADS)

    Zoethout, Erwin; Louis, Eric; Bijkerk, Fred

    2016-09-01

    Angle resolved x-ray photoelectron spectroscopy (ARXPS) has been employed to determine non-destructively the in-depth interface formation during thin film growth. Buried interfaces underneath the nanometer thick layers are probed by identifying the chemical shift of compound materials in photoelectron spectroscopy and using the angular response to quantify the compound amounts from the measured intensities. The thin interfaces in molybdenum-silicon multilayers grown at ambient temperature are investigated. This system is an example of an almost perfect 1D-system, where the interface region is only a small part of the individual layer thicknesses of 3 to 5 nm. Despite the low growth temperature, both the interfaces of this multilayer show layer thickness dependent interface formation. While the silicon-on-molybdenum interface shows a limited interface thickness of 0.4 nm of Mo5Si3, the molybdenum-on-silicon interface shows a more complex evolution. For this interface, the composition of the first 2.0 nm of deposited layer thickness is best described as a molybdenum-silicon compound layer with a molybdenum rich top and a MoSi2 bottom layer. After 2.5 nm of the deposited layer thickness, the molybdenum rich compound at the top has transformed into polycrystalline molybdenum on top of 1.8 nm MoSi2 at the interface. The formation of the 1.8 nm MoSi2 precedes the formation of polycrystalline molybdenum on top. Angle resolved x-ray photoelectron spectroscopy (ARXPS) is shown to be a good tool to study the interface phenomena beneath the nanometer thick top layers. In the case of Mo/Si multilayer mirrors, this ARXPS study shows that the compound formation at the interface accounts for the majority of the extreme ultraviolet reflectance loss.

  17. The unexpected mechanism of carbonyl hydrosilylation catalyzed by (Cp)(ArN[double bond, length as m-dash])Mo(H)(PMe(3)).

    PubMed

    Shirobokov, Oleg G; Gorelsky, Serge I; Simionescu, Razvan; Kuzmina, Lyudmila G; Nikonov, Georgii I

    2010-11-01

    Complex (Cp)(ArN[double bond, length as m-dash])Mo(H)(PMe(3)) (2, Ar = 2,6-diisopropylphenyl) catalyzes the hydrosilylation of carbonyls by an unexpected associative mechanism. Complex 2 also reacts with PhSiH(3) by a σ-bond metathesis mechanism to give the silyl derivative (Cp)(ArN[double bond, length as m-dash])Mo(SiH(2)Ph)(PMe(3)).

  18. Method to adjust multilayer film stress induced deformation of optics

    DOEpatents

    Spiller, Eberhard A.; Mirkarimi, Paul B.; Montcalm, Claude; Bajt, Sasa; Folta, James A.

    2000-01-01

    Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.

  19. Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

    SciTech Connect

    Jody Corso, Alain; Nicolosi, Piergiorgio; Nardello, Marco; Guglielmina Pelizzo, Maria; Barkusky, Frank; Mann, Klaus; Mueller, Matthias

    2013-05-28

    Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials were exposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiation damage mechanism. Morphology of single-shot damaged areas has been analyzed by means of atomic force microscopy. Threshold fluences were evaluated for each type of sample in order to determine the capability of the capping layer to protect the structure underneath.

  20. Spectroscopic characterization of novel multilayer mirrors intended for astronomical and laboratory applications

    NASA Astrophysics Data System (ADS)

    Ragozin, Eugene N.; Mednikov, Konstantin N.; Pertsov, Andrei A.; Pirozhkov, Alexander S.; Reva, Anton A.; Shestov, Sergei V.; Ul'yanov, Artem S.; Vishnyakov, Eugene A.

    2009-05-01

    We report measurements of the reflection spectra of (i) concave (spherical and parabolic) Mo/Si, Mg/Si, and Al/Zr multilayer mirrors (MMs) intended for imaging solar spectroscopy in the framework of the TESIS/CORONAS-FOTON Satellite Project and of (ii) an aperiodic Mo/Si MM optimized for maximum uniform reflectivity in the 125-250 Å range intended for laboratory applications. The reflection spectra were measured in the configuration of a transmission grating spectrometer employing the radiation of a tungsten laser-driven plasma as the source. The function of detectors was fulfilled by backside-illuminated CCDs coated with Al or Zr/Si multilayer absorption filters. High-intensity second-order interference reflection peaks at wavelengths of about 160 Å were revealed in the reflection spectra of the 304-Å Mo/Si MMs. By contrast, the second-order reflection peak in the spectra of the new-generation narrow-band (~12 Å FWHM) 304-Å Mg/Si MMs is substantially depressed. Manifestations of the NEXAFS structure of the L2, 3 absorption edges of Al and Al2O3 were observed in the spectra recorded. The broadband Mo/Si MM was employed as the focusing element of spectrometers in experiments involving (i) the charge exchange of multiply charged ions with the donor atoms of a rare-gas jet; (ii) the spectroscopic characterization of a debris-free soft X-ray radiation source excited by Nd laser pulses in a Xe jet (iii) near-IR-to-soft-X-ray frequency conversion (double Doppler effect) occurring in the retroreflection from the relativistic electron plasma wake wave (flying mirror) driven by a multiterawatt laser in a pulsed helium jet.

  1. Silicide Coating Fabricated by HAPC/SAPS Combination to Protect Niobium Alloy from Oxidation.

    PubMed

    Sun, Jia; Fu, Qian-Gang; Guo, Li-Ping; Wang, Lu

    2016-06-22

    A combined silicide coating, including inner NbSi2 layer and outer MoSi2 layer, was fabricated through a two-step method. The NbSi2 was deposited on niobium alloy by halide activated pack cementation (HAPC) in the first step. Then, supersonic atmospheric plasma spray (SAPS) was applied to obtain the outer MoSi2 layer, forming a combined silicide coating. Results show that the combined coating possessed a compact structure. The phase constitution of the combined coating prepared by HAPC and SAPS was NbSi2 and MoSi2, respectively. The adhesion strength of the combined coating increased nearly two times than that for single sprayed coating, attributing to the rougher surface of the HAPC-bond layer whose roughness increased about three times than that of the grit-blast substrate. After exposure at 1200 °C in air, the mass increasing rate for single HAPC-silicide coating was 3.5 mg/cm(2) because of the pest oxidation of niobium alloy, whereas the combined coating displayed better oxidation resistance with a mass gain of only 1.2 mg/cm(2). Even more, the combined coating could significantly improve the antioxidation ability of niobium based alloy at 1500 °C. The good oxidation resistance of the combined silicide coating was attributed to the integrity of the combined coating and the continuous SiO2 protective scale provided by the oxidation of MoSi2. PMID:27243944

  2. Heat treatment giving a stable high temperature micro-structure in cast austenitic stainless steel

    DOEpatents

    Anton, Donald L.; Lemkey, Franklin D.

    1988-01-01

    A novel micro-structure developed in a cast austenitic stainless steel alloy and a heat treatment thereof are disclosed. The alloy is based on a multicomponent Fe-Cr-Mn-Mo-Si-Nb-C system consisting of an austenitic iron solid solution (.gamma.) matrix reinforced by finely dispersed carbide phases and a heat treatment to produce the micro-structure. The heat treatment includes a prebraze heat treatment followed by a three stage braze cycle heat treatment.

  3. Effect of structure and deposition technology on tribological properties of DLC coatings alloyed with VIA group metals

    NASA Astrophysics Data System (ADS)

    Khrushchov, M.; Levin, I.; Marchenko, E.; Avdyukhina, V.; Petrzhik, M.

    2016-07-01

    The results of a comprehensive research on atomic structure, phase composition, micromechanical and tribological characteristics of alloyed DLC coatings have been presented. The coatings have been deposited by reactive magnetron sputtering in acetylene-nitrogen gas mixtures of different compositions (a-C:H:Cr), by plasma-assisted chemical vapor deposition in atmospheres of silicone-organic precursor gases (a-C:H:Mo:Si), and by nonreactive magnetron sputtering of a composite target (a-C:H:W).

  4. Preparation of microspheres by an emulsification-complexation method.

    PubMed

    Kim, Jin-Chul; Song, Myeong-Eun; Lee, Eun-Joo; Park, Seung-Kyu; Rang, Moon-Jeong; Ahn, Ho-Jeong

    2002-04-01

    Microspheres were prepared by complexation of a cationic polymer, polyquaternium-24, and an anionic surfactant, sodium lauryl sulfate (SLS). The cationic polymer solution was emulsified in dimethylsiloxane to give water in silicone emulsion (W/Si), and it was used as a template for the formation of microspheres. The emulsion was dispersed into the SLS solution. In this process, two kinds of droplets, silicone dropletes and microspheres composed of the cationic polymer and SLS, were formed, evidenced by X-ray energy dispersive spectra. The mean diameter of the microspheres was reduced from 105.7 to 64.8 mum as the stirring rate for W/Si preparation increased from 300 to 1000 rpm. It is believed that water droplets in W/Si emulsion, when exposed to SLS solution, could be solidified by the complexation of the cationic polymer and the anionic surfactant.

  5. Preparation of microspheres by an emulsification-complexation method.

    PubMed

    Kim, Jin-Chul; Song, Myeong-Eun; Lee, Eun-Joo; Park, Seung-Kyu; Rang, Moon-Jeong; Ahn, Ho-Jeong

    2002-04-01

    Microspheres were prepared by complexation of a cationic polymer, polyquaternium-24, and an anionic surfactant, sodium lauryl sulfate (SLS). The cationic polymer solution was emulsified in dimethylsiloxane to give water in silicone emulsion (W/Si), and it was used as a template for the formation of microspheres. The emulsion was dispersed into the SLS solution. In this process, two kinds of droplets, silicone dropletes and microspheres composed of the cationic polymer and SLS, were formed, evidenced by X-ray energy dispersive spectra. The mean diameter of the microspheres was reduced from 105.7 to 64.8 mum as the stirring rate for W/Si preparation increased from 300 to 1000 rpm. It is believed that water droplets in W/Si emulsion, when exposed to SLS solution, could be solidified by the complexation of the cationic polymer and the anionic surfactant. PMID:16290495

  6. Microstructure and Sliding Wear Behavior of Fe-Based Coatings Manufactured with HVOF and HVAF Thermal Spray Processes

    NASA Astrophysics Data System (ADS)

    Milanti, A.; Matikainen, V.; Bolelli, G.; Koivuluoto, H.; Lusvarghi, L.; Vuoristo, P.

    2016-06-01

    The microstructure and micromechanical behavior of thermally sprayed Fe-based coatings manufactured with high-velocity oxygen fuel (HVOF) and high-velocity air fuel (HVAF) processes were investigated. Fe-Cr-Ni-Si-B-C and Fe-Cr-Ni-Mo-Si-B-C powders were used as the feedstock materials. The coatings showed a highly dense microstructure with near-zero oxidation. The microstructure of the feedstock powders was better retained when sprayed with HVAF process. Differential scanning calorimetry revealed two small exothermic peaks at about 600 °C for the HVOF-sprayed coatings, without any increase in weight in thermogravimetric analysis. It suggested the re-precipitation of carbides that were dissolved during spraying due to the higher particle temperature reported by spray diagnostics system during the HVOF process (≈1800 °C) compared to the HVAF one (≈1400 °C). Micro- and nano-indentations helped to show the difference in inter-lamellar cohesive strength and, in turn, in the particle deposition mechanism. Coatings sprayed with Fe-Cr-Ni-Mo-Si-B-C composition possessed higher sliding wear resistance than that of Fe-Cr-Ni-Si-B-C due to higher nano-hardness. More specifically, HVOF-sprayed Fe-Cr-Ni-Mo-Si-B-C coating showed the largest intra-lamellar hardness, the largest elasticity, and high quality of particle interfaces which resulted in lower sliding wear rate.

  7. Reflective masks for extreme ultraviolet lithography

    SciTech Connect

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  8. Nano-composite coatings with improved mechanical properties and corrosion resistance by thermal spraying

    NASA Astrophysics Data System (ADS)

    Zhong, X. C.; Liu, Z. W.; Wu, Y. S.; Liu, M. T.; Zeng, D. C.

    2014-06-01

    This paper reports the synthesis and characterization of nanostructured coatings. To improve the mechanical properties and oxidation resistance of the materials, two new types of nanostructured coatings including CoNiCrAlY-MoSi2 and Ni60-TiB2 were designed. The nanocrystalline feedstock powders were prepared by high energy ball milling (HEBM). The particle size, morphology and grain size of the feed stocks were investigated. The preparation, microstructure, mechanical properties, and anti-oxidation behavior of the nanostructured CoNiCrAlY-MoSi2 and Ni60-TiB2 coatings are presented. With a lamellar and compact structure, the optimized nano-composite CoNiCrAlY-MoSi2 coatings is metallurgically bonded with the substrate. It exhibits low porosity, high fracture toughness and excellent thermal shock resistance. The nanostructured Ni60-TiB2 composite coatings also exhibited better mechanical properties and wear-corrosion resistance than those of its conventional counterpart. This work is expected to play an important role in the preparation and application of high performance nanostructured coatings.

  9. Diffusion structures in Mo vs. Si solid-solid diffusion couples

    SciTech Connect

    Tortorici, P.C.; Dayananda, M.A.

    1998-05-12

    Silicides of refractory metals have been employed in a wide variety of industrial applications ranging from electronics to aerospace technology. Silicide films are employed extensively in the electronics industry as contacts and interconnects in integrated silicon devices. Interest in silicides and silicide-based composites for high temperature applications has been renewed in recent years. MoSi{sub 2} possesses many of the favorable properties that are required for a high temperature material. MoSi{sub 2} has a high melting point, low density, excellent high temperature oxidation and corrosion resistance, and it exhibits metallic-like thermal and electrical conductivity. A few studies have been carried out on the growth of silicides in the Mo vs. Si system but have reported different results on layer growth kinetics. The objective of the present study was to investigate diffusion structures in Mo vs. Si solid-solid diffusion couples annealed at selected temperatures between 900--1,350 C and to explore the stoichiometry and texture of the MoSi{sub 2} diffusion layer.

  10. JOINING OF MOLYBDENUM DISILICIDE TO STAINLESS STEEL USING AMORPHOUS METAL BRAZES-RESIDUAL STRESS ANALYSIS

    SciTech Connect

    VAIDYA, RAJENDRA U; KAUTZ, DOUGLAS D.; GALLEGOS, DAVID E.

    2007-01-30

    Molybdenum disilicide (MoSi{sub 2})/stainless steel 316 L jOints were produced by high temperature brazing using a cobalt-based metallic-glass (METGLAS{trademark} 2714A). Successful joining was completed in two different ways; either by feeding excess braze into the braze gap upon heating or by constraining the MoSi{sub 2}/stainiess steel assembly with an alumina (Al{sub 2}O{sub 3}) fixture during the heating cycle. These steps were necessary to ensure the production of a high quality void free joint. Residual stress measurements were completed on these joints. Indentation results show higher tensile residual stresses in the stainless steel for the joint with the external constraint, in comparison to the unconstrained state. In contrast, the compressive residual stresses In the MoSi{sub 2} (as measured by X-ray diffraction) were lower in the constrained state relative to the unconstrained state. These results and a lack of residual stress balance indicate that the stress state in the braze is significantly different under the two joining conditions and the volume of the braze plays an important role in the development of the residual stresses. Push-out tests carried out on these joints gave higher joint strengths in the unconstrained as compared to the constrained condition. The results of this study have important implications on the selection of the appropriate joining process (use of constraint versus extra braze).

  11. Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short-wave scattering intensity. I. Gratings

    PubMed Central

    Goray, Leonid; Lubov, Maxim

    2013-01-01

    It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques. PMID:24046500

  12. Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short-wave scattering intensity. I. Gratings.

    PubMed

    Goray, Leonid; Lubov, Maxim

    2013-08-01

    It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques. PMID:24046500

  13. Softening Behavior of Hardness and Surface Fatigue of Rolling-Sliding Contact in the Case of Developed Alloy Steels

    NASA Astrophysics Data System (ADS)

    Redda, Daniel Tilahun; Nakanishi, Tsutomu; Deng, Gang

    To get high performance, downsizing and weight saving of the power transmission systems, the improvement of machine elements has been required. In this study, case-carburized gear materials for a high load-carrying capacity were developed. Low-alloyed steels with 1%Cr-0.2%Mo, 1%Cr-0.2%Mo-1%Si and 1%Cr-0.2%Mo-2%Ni (Cr-Mo steel, Cr-Mo-Si steel and Cr-Mo-Ni steel) were melted in a hypoxia vacuum. Test rollers were made of the developed steels, and they were carburized (Type A and Type B), hardened and tempered. Heating retention tests were carried out to investigate the softening behavior of hardness at high heating temperatures in the case of the developed steels. Roller tests were conducted under the rolling-sliding contact and high-load conditions to study the surface fatigue of the developed steels. From the obtained test results, it was found that the softening behavior of surface hardness at high temperatures in the cases of Cr-Mo-Si steel (Type A) and Cr-Mo-Ni steel (Type B) is lower than that in the cases of Cr-Mo steel (Type A) and Cr-Mo steel (Type B). In the cases of Cr-Mo-Si steel (A) and Cr-Mo-Ni steel (B), micro- and small-pitting area ratios are smaller and large-pitting life is longer than those in the cases of Cr-Mo steel(A) and Cr-Mo steel(B) under the same carburizing treatment method and high-load conditions. Furthermore, the relationship between the softening behavior of surface hardness on the heating pattern and the surface fatigue on the rolling-sliding contact of the developed alloy steels was clarified.

  14. Low-cost method for producing extreme ultraviolet lithography optics

    DOEpatents

    Folta, James A.; Montcalm, Claude; Taylor, John S.; Spiller, Eberhard A.

    2003-11-21

    Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

  15. Extreme ultra-violet movie camera for imaging microsecond time scale magnetic reconnection

    SciTech Connect

    Chai, Kil-Byoung; Bellan, Paul M.

    2013-12-15

    An ultra-fast extreme ultra-violet (EUV) movie camera has been developed for imaging magnetic reconnection in the Caltech spheromak/astrophysical jet experiment. The camera consists of a broadband Mo:Si multilayer mirror, a fast decaying YAG:Ce scintillator, a visible light block, and a high-speed visible light CCD camera. The camera can capture EUV images as fast as 3.3 × 10{sup 6} frames per second with 0.5 cm spatial resolution. The spectral range is from 20 eV to 60 eV. EUV images reveal strong, transient, highly localized bursts of EUV radiation when magnetic reconnection occurs.

  16. Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics

    SciTech Connect

    Salmassi, Farhad; Gullikson, Eric M.; Anderson, Erik H.; Naulleau, Patrick P.

    2007-05-01

    The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.

  17. Oxidation behavior of Mn and Mo alloyed Fe-16Ni-(5-8)Cr-3. 2Si-1. 0Al

    SciTech Connect

    Rawers, J.C.; Oh, J.M.; Dunning, J. )

    1990-02-01

    Oxidation tests were conducted on a master alloy, Fe-16Ni-(5-8)Cr-3Si-1Al, to which (0-4) wt/o pct Mn and/or Mo were added. Tests were conducted at temperatures ranging from 1,073-1,273 K for times up to 1,000 hr. Additions of Mn resulted in formation of a dual oxide structure and decreased oxidation protection. Addition of Mo significantly improved oxidation protection by formation of an intermetallic Fe(Mo)Si precipitate that eventually formed a protective SiO{sub 2} oxide sublayer. The oxidation protection was related to the alloy components and concentration.

  18. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N; Baker, S L; Robinson, J C; Taylor, J S; Aquila, A; Edwards, N V

    2005-06-15

    The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

  19. Oxidation resistance of Ru-capped EUV multilayers

    SciTech Connect

    Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J; Nguyen, N; Baker, S; Robinson, J C; Taylor, J S; Clift, M; Aquila, A; Gullikson, E M; Edwards, N G

    2005-02-23

    Differently prepared Ru-capping layers, deposited on Mo/Si EUV multilayers, have been characterized using a suite of metrologies to establish their baseline structural, optical, and surface properties in as-deposited state. Same capping layer structures were tested for their thermal stability and oxidation resistance. Post-mortem characterization identified changes due to accelerated tests. The best performing Ru-capping layer structure was studied in detail with transmission electron microscopy to identify the grain microstructure and texture. This information is essential for modeling and performance optimization of EUVL multilayers.

  20. Composition of RF-sputtered refractory compounds determined by X-ray photoelectron spectroscopy

    NASA Technical Reports Server (NTRS)

    Wheeler, D. R.; Brainard, W. A.

    1978-01-01

    RF-sputtered coatings of CrB2, MoSi2, Mo2C, TiC, and MoS2 were examined by X-ray photoelectron spectroscopy (XPS). Data on stoichiometry, impurity content, and chemical bonding were obtained. The influences of sputtering target history, deposition time, RF power level, and substrate bias were studied. Significant deviations from stoichiometry and high oxide levels were related to target outgassing. The effect of substrate bias depended on the particular coating material studied.

  1. Toward the development of a soft x-ray reflection imaging microscope in the Schwarzschild configuration using a soft x-ray laser at 18. 2 nm

    SciTech Connect

    Dicicco, D.; Rosser, R. ); Kim, D.; Suckewer, S. . Plasma Physics Lab.)

    1991-12-01

    We present the recent results obtained from a soft X-ray reflection imaging microscope in the Schwarzschild configuration. The microscope demonstrated a spatial resolution of 0.7 {mu}m with a magnification of 16 at 18.2 nm. The soft X-ray laser at 18.2 nm was used as an X-ray source. Mo/Si multilayers were coated on the Schwarzschild optics and the normal incidence reflectivity at 18.2 nm per surface was measured to be {approximately} 20 %. 18 refs., 6 figs.

  2. Radiation Effect on Microstructural Stability of RERTR Fuel

    SciTech Connect

    J. Gan; D. D. Keiser, Jr.; B. D. Miller; T. R. Allen; D. M. Wachs

    2008-03-01

    Three depleted uranium alloys are successfully cast for the radiation stability studies of the fuel-cladding interaction product using proton irradiation. SEM analysis indicates the presence of the phases of interest: U(Si,Al)3, (U,Mo)(Si,Al)3 and a mixture of UMo2Al20, U6Mo4Al43, and UAl4. Irradiation with 2.6 MeV protons at 200ºC to the doses of 0.1, 1.0 and 3.0 dpa are carried out.

  3. Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission

    SciTech Connect

    Kronast, F.; Ovsyannikov, R.; Kaiser, A.; Wiemann, C.; Yang, S.-H.; Locatelli, A.; Burgler, D.E.; Schreiber, R.; Salmassi, F.; Fischer, P.; Durr, H.A.; Schneider, C.M.; Eberhardt, W.; Fadley, C.S.

    2008-11-24

    We present an extension of conventional laterally resolved soft x-ray photoelectron emission microscopy. A depth resolution along the surface normal down to a few {angstrom} can be achieved by setting up standing x-ray wave fields in a multilayer substrate. The sample is an Ag/Co/Au trilayer, whose first layer has a wedge profile, grown on a Si/MoSi2 multilayer mirror. Tuning the incident x-ray to the mirror Bragg angle we set up standing x-ray wave fields. We demonstrate the resulting depth resolution by imaging the standing wave fields as they move through the trilayer wedge structure.

  4. Circular multilayer zone plate for high-energy x-ray nano-imaging

    SciTech Connect

    Koyama, Takahisa; Takano, Hidekazu; Konishi, Shigeki; Tsuji, Takuya; Kagoshima, Yasushi; Takenaka, Hisataka; Ichimaru, Satoshi; Ohchi, Tadayuki

    2012-01-15

    A circular multilayer zone plate (MZP) was fabricated and its focusing performance was evaluated using 20-keV x-rays. MoSi{sub 2} and Si layers were alternately deposited by DC magnetron sputtering on a wire core; all the interfaces satisfied the Fresnel zone condition. The measured line spread function was converted to a point spread function by tomographic reconstruction. The results suggest that the MZP has the potential to realize the diffraction-limited resolving power, which is calculated to be 35 nm using the diffraction integral. Furthermore, scanning transmission microscopy using the MZP could resolve a 50-nm line-and-space pattern.

  5. Ohmic contacts to GaAs for high-temperature device applications

    NASA Technical Reports Server (NTRS)

    Anderson, W. T., Jr.; Christou, A.; Giuliani, J. F.; Dietrich, H. B.

    1981-01-01

    Ohmic contacts to n-type GaAs were developed for high temperature device applications up to 300 C. Refractory metallizations were used with epitaxial Ge layers to form the contacts: TiW/Ge/GaAs, Ta/Ge/GaAs, Mo/Ge/GaAs, and Ni/Ge/GaAs. Contacts with high dose Si or Se ion implantation of the Ge/GaAs interface were also investigated. The contacts were fabricated on epitaxial GaAs layer grown on N+ or semi-insulating GaAs substrates. Ohmic contact was formed by both thermal annealing (at temperatures up to 700 C) and laser annealing (pulsed Ruby). Examination of the Ge/GaAs interface revealed Ge migration into GaAs to form an N+ doping layer. The specific contact resistances of specimens annealed by both methods are given.

  6. Effect of Silicon on Activity Coefficients of Siderophile Elements (P, Au, Pd, As, Ge, Sb, and In) in Liquid Fe, with Application to Core Formation

    NASA Technical Reports Server (NTRS)

    Righter, K.; Pando, K.; Danielson, L. R.; Humayun, M.; Righter, M.; Lapen, T.; Boujibar, A.

    2016-01-01

    Earth's core contains approximately 10 percent light elements that are likely a combination of S, C, Si, and O, with Si possibly being the most abundant. Si dissolved into Fe liquids can have a large effect on the magnitude of the activity coefficient of siderophile elements (SE) in Fe liquids, and thus the partitioning behavior of those elements between core and mantle. The effect of Si can be small such as for Ni and Co, or large such as for Mo, Ge, Sb, As. The effect of Si on many siderophile elements is unknown yet could be an important, and as yet unquantified, influence on the core-mantle partitioning of SE. Here we report new experiments designed to quantify the effect of Si on the partitioning of P, Au, Pd, and many other SE between metal and silicate melt. The results will be applied to Earth, for which we have excellent constraints on the mantle siderophile element concentrations.

  7. Electrical properties of TiN on gallium nitride grown using different deposition conditions and annealing

    SciTech Connect

    Li, Liuan; Kishi, Akinori; Shiraishi, Takayuki; Jiang, Ying; Wang, Qingpeng; Ao, Jin-Ping

    2014-03-15

    This study evaluates the thermal stability of different refractory metal nitrides used as Schottky electrodes on GaN. The results demonstrate that TiN, MoSiN, and MoN possess good rectification and adhesion strength, with barrier heights of 0.56, 0.54, and 0.36 eV, respectively. After thermal treatment at 850 °C for 1 min, the TiN and MoN electrodes still exhibit rectifying characteristics, while the MoSiN degrades to an ohmic-like contact. For further study, several TiN films are deposited using different N{sub 2}/Ar reactive/inert sputtering gas ratios, thereby varying the nitrogen content present in the sputtering gas. Ohmic-like contact is observed with the pure Ti contact film, and Schottky characteristics are observed with the samples possessing nitrogen in the film. The average Schottky barrier height is about 0.5 eV and remains virtually constant with varying nitrogen deposition content. After examining Raman spectra and x-ray photoelectron spectroscopy results, the increase in the film resistivity after thermal treatment is attributed to oxidation and/or nitridation. Films deposited with a medium (40% and 60%) nitrogen content show the best film quality and thermal stability.

  8. Solidification behavior during directed light fabrication

    SciTech Connect

    Thoma, D.J.; Lewis, G.K.; Nemec, R.B.

    1995-10-01

    Directed light fabrication (DLF) is a process that fuses gas delivered metal powders within a focal zone of a laser beam to produce fully dense, 3-dimensional metal components. A variety of materials have been processed with DLF, ranging from steels to tungsten, and including intermetallics such as NiAl and MoSi{sub 2}. To evaluate the processing parameters and resulting microstructures, solidification studies have been performed on defined alloy systems. For example, solidification cooling rates have been determined based upon secondary dendrite arm spacings in Fe-based alloys. In addition, eutectic spacings have been used to define growth velocities during solidification. Cooling rates vary from 10{sup 1}-10{sup 5} K s{sup {minus}1} and growth rates vary between 1--50 mm s{sup {minus}1}. As a result, process definition has been developed based upon the microstructural development during solidification. The materials explored were Ag-19Cu, Fe-24.8Ni, 316 stainless steel, Al-33Cu, W, MoSi{sub 2} and NiAl.

  9. Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

    SciTech Connect

    Park, Y. R.; Ahn, J. H.; Kim, J. S.; Kwon, B. S.; Lee, N.-E.; Kang, H. Y.; Hwangbo, C. K.; Ahn, Jinho; Seo, Hwan Seok

    2010-07-15

    Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics with a completely different configuration than those of conventional photolithography. This study investigated the etching properties of indium tin oxide (ITO) binary mask materials for EUVL, such as ITO (absorber layer), Ru (capping/etch-stop layer), and a Mo-Si multilayer (reflective layer), by varying the Cl{sub 2}/Ar gas flow ratio, dc self-bias voltage (V{sub dc}), and etch time in inductively coupled plasmas. The ITO absorber layer needs to be etched with no loss in the Ru layer on the Mo-Si multilayer for fabrication of the EUVL ITO binary mask structure proposed here. The ITO layer could be etched with an infinitely high etch selectivity over the Ru etch-stop layer in Cl{sub 2}/Ar plasma even with a very high overetch time.

  10. Characterization and Hydrodesulfurization Properties of Catalysts Derived from Amorphous Metal-boron Materials

    SciTech Connect

    Parks, Greg; Pease, Melissa; Layman, Kathryn A.; Burns, Autumn W.; Bussell, Mark E.; Wang, Xianqin; Hanson, Jonathan; Rodriguez, Jose A.

    2007-01-22

    Unsupported and silica-supported amorphous metal-boron materials (Ni-B, Mo-O-B, and Ni-Mo-O-B) were prepared by NaBH4 reduction of aqueous or impregnated metal salts. The resulting materials were characterized by a range of techniques, including conventional and time-resolved X-ray diffraction. The latter technique was used to determine the onset of crystallization of the amorphous materials during annealing in He flow and to identify the phases formed. Annealing of unsupported Ni-B resulted in the crystallization of predominantly Ni3B, followed by Ni metal, whereas Ni-B/SiO2 formed Ni and then NiO. There was no evidence for crystallization of B-containing phases for Mo-O-B or Mo-O-B/SiO2 on annealing; instead, the predominant phase formed was MoO2. In general, the phases formed for Ni-Mo-O-B and Ni-Mo-O-B/SiO2 were consistent with those formed in the monometallic materials, but at higher annealing temperatures. Catalysts prepared by sulfiding Ni-B/SiO2 and Ni-Mo-O-B/SiO2 materials had significantly higher thiophene HDS activities than conventionally prepared sulfided Ni/SiO2 and Ni-Mo/SiO2 catalysts, whereas a sulfided Mo-O-B/SiO2 catalyst had a dramatically lower HDS activity than a sulfided Mo/SiO2 catalyst.

  11. Processing, Microstructure, and Properties of Multiphase Mo Silicide Alloys

    SciTech Connect

    Heatherly, L.; Liu, C.T.; Schneibel, J.H.

    1998-11-30

    Multiphase Mo silicide alloys containing T2 (Mo{sub 5}SiB{sub 2}), Mo{sub 3}Si and Mo phases where prepared by both melting and casting (M and C) and powder metallurgical (PM) processes. Glassy phases are observed in PM materials but not in M and C materials. Microstructural studies indicate that the primary phase is Mo-rich solid solution in alloys containing {le}(9.4Si+13.8B, at. %) and T2 in alloys with {ge}(9.8Si+14.6B). An eutectic composition is estimated to be close to Mo-9.6Si-14.2B. The mechanical properties of multiphase silicide alloys were determined by hardness, tensile and bending tests at room temperature. The multiphase alloy MSB-18 (Mo-9.4Si-13.8B) possesses a flexure strength distinctly higher than that of MoSi{sub 2} and other Mo{sub 5}Si{sub 3} silicide alloys containing no Mo particles. Also, MSB-18 is tougher than MoSi{sub 2} by a factor of 4.

  12. Novel EUV Mask Blank Defect Repair Developments

    SciTech Connect

    Hau-Riege, S; Barty, A; Mirkarimi, P

    2003-03-31

    The development of defect-free reticle blanks is an important challenge facing the commercialization of extreme ultraviolet lithography (EUVL). The basis of EUVL reticles are mask blanks consisting of a substrate and a reflective Mo/Si multilayer. Defects on the substrate or defects introduced during multilayer deposition can result in critical phase and amplitude defects. Amplitude- or phase-defect repair techniques are being developed with the goal to repair many of these defects. In this report, we discuss progress in two areas of defect repair: (1) We discuss the effect of the residual reflectance variation over the repair zone after amplitude-defect repair on the process window. This allows the determination of the maximum tolerable residual damage induced by amplitude defect repair. (2) We further performed a quantitative assessment of the yield improvement due to defect repair. We found that amplitude- and phase-defect repair have the potential to significantly improve mask blank yield. Our calculations further show that yield can be maximized by increasing the number of Mo/Si bilayers.

  13. Resonant ultrasound spectroscopy: Elastic properties of some intermetallic compounds

    SciTech Connect

    Chu, F.; Thoma, D.J.; He, Y.; Maloy, S.A.; Mitchell, T.E.

    1996-09-01

    A novel nondestructive evaluation method, resonant ultrasound spectroscopy (RUS), is reviewed with an emphasis upon defining the elastic properties of intermetallic phases. The applications and advantages of RUS as compared to other conventional elastic constant measurement methods are explained. RUS has been employed to measure the elastic properties of single crystal and/or polycrystalline intermetallics, such as Laves phases (C15 HfV{sub 2} and NbCr{sub 2}), Nb-modified titanium aluminides, and transition metal disilicides (C11{sub b} MoSi{sub 2}, C40 NbSi{sub 2} and TaSi{sub 2}). For Laves phases, the elastic properties of HfV{sub 2}-based C15 phases show various anomalies and those of C15 NbCr{sub 2} do not. For Nb-modified titanium aluminides, the elastic properties of O-phase alloys are investigated as a function of alloying content. For transition metal disilicides, single crystal elastic constants of MoSi{sub 2}, NbSi{sub 2}, and TaSi{sub 2} are obtained and compared. Based on the experimentally determined elastic properties, the characteristics of interatomic bonding in these materials are examined and the possible impact of the elastic properties on mechanical behavior is discussed.

  14. Molten glass corrosion resistance of immersed combustion-heating tube materials in soda-lime-silicate glass

    SciTech Connect

    Sundaram, S.K.; Hsu, J.Y.; Speyer, R.F. . School of Materials Science and Engineering)

    1994-06-01

    The corrosion resistance of molybdenum, molybdenum disilicide, and a SiC[sub (p)]/Al[sub 2]O[sub 3] composite to molten soda-lime-silicate glass was studied. The ASTM-C621-84 corrosion test method was modified because of inherent inaccuracies in the method and Si attack of platinum crucibles. Specimen-glass interfacial regions were characterized using XRD, SEM, and EDS. After 48 h of exposure at 1,565 C, the half-down corrosion recessions of Mo, MoSi[sub 2], and SiC[sub (p)]/Al[sub 2]O[sub 3] were 0.11, 0.316, and 0.26 mm, respectively. Mo oxidized to form a MoO[sub 2] surface scale which cracked, allowing glass seepage and further oxidation. Silicon was leached out of MoSi[sub 2] into the glass, leaving a Mo[sub 5]Si[sub 3] interface and particles of Mo near the interface. For the SiC[sub (p)]/Al[sub 2]O[sub 3] composite, bubbles observed at the interfacial regions formed from oxidation of SiC to form CO. Thermodynamic modeling corroborated these experimental observations. The work discussed herein is part of a larger research thrust to develop materials for immersed gas-fired radiant burner tubes for glass melters.

  15. Amorphous molybdenum silicon superconducting thin films

    SciTech Connect

    Bosworth, D. Sahonta, S.-L.; Barber, Z. H.; Hadfield, R. H.

    2015-08-15

    Amorphous superconductors have become attractive candidate materials for superconducting nanowire single-photon detectors due to their ease of growth, homogeneity and competitive superconducting properties. To date the majority of devices have been fabricated using W{sub x}Si{sub 1−x}, though other amorphous superconductors such as molybdenum silicide (Mo{sub x}Si{sub 1−x}) offer increased transition temperature. This study focuses on the properties of MoSi thin films grown by magnetron sputtering. We examine how the composition and growth conditions affect film properties. For 100 nm film thickness, we report that the superconducting transition temperature (Tc) reaches a maximum of 7.6 K at a composition of Mo{sub 83}Si{sub 17}. The transition temperature and amorphous character can be improved by cooling of the substrate during growth which inhibits formation of a crystalline phase. X-ray diffraction and transmission electron microscopy studies confirm the absence of long range order. We observe that for a range of 6 common substrates (silicon, thermally oxidized silicon, R- and C-plane sapphire, x-plane lithium niobate and quartz), there is no variation in superconducting transition temperature, making MoSi an excellent candidate material for SNSPDs.

  16. Prediction of Reaction Kinetic in Mechanically Activated Self-Propagating High-Temperature Synthesis Process

    NASA Astrophysics Data System (ADS)

    Razavi, Mansour

    2012-12-01

    In this paper we have tried to develop a semi-empirical formula for estimation of starting time of reactions during mechanical alloying process according to self-propagating high temperature synthesis (SHS) mechanism. For this purpose, three SHS systems containing Ti-C, Mo-Si and Si-C were selected and their behaviors were observed. Aforementioned systems were milled in a planetary ball mill equipped with temperature sensor detector of cups. Samplings were done at different times of discontinuously milling. To change mills' energy, stainless steel and tungsten carbide balls were used. In order to detect the phases and characterizations of milled powder, XRD instrument was utilized. Results showed that all productions were synthesized after sudden increase in temperature. Maximum measured temperature and critical time had up and downtrends for production of TiC, MoSi2 and SiC, respectively. Crystalline size of milled powder had nano-meter scale. By using experimental data along with theoretical equations, a semi-empirical formula between critical time for transformation of raw materials to productions, type of milled system and ball mill parameter can be presented with high accuracy. According to calculated formula, critical time was related to ball mill energy and Gibbs free energy of milled system with direct and inverse proportionality, respectively.

  17. Development of Multilayer Optics for EUV, Soft X-Ray and X-Ray Regions in IPOE

    NASA Astrophysics Data System (ADS)

    Wang, Z. S.; Zhu, J. T.; Wang, F. L.; Zhang, Z.; Wang, H. C.; Qin, S. J.; Chen, L. Y.

    In EUV and X-ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X-ray optics for next generation lithography system, microscopy in the "water windows", astronomy telescope, spectroscopy, plasma diagnostics, and X-ray laser have impelled the development of multilayer. This report introduced the recent results of the multilayer optics elements in institute of precision optical engineering (IPOE), Tongji University, China, including beam splitters, broad band/angular polarizers, supermirrors, and high-reflectance mirrors. The product of reflectivity and transmittance is above 4% for the Mo/Si multilayer beam splitter at 13.9 nm. Over the 15-17 nm wavelength range, the s-reflectivity of the non-periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. The experimental results of some X-ray supermirrors and high-reflectance mirrors in our lab were also presented.

  18. Development of Multilayer Optics in EUV, Soft X-Ray and X-Ray Range at IPOE

    NASA Astrophysics Data System (ADS)

    Wang, Zhanshan; Zhu, Jingtao; Zhang, Zhong; Cheng, Xinbin; Xu, Jing; Wang, Fengli; Wang, Xiaoqiang; Chen, Lingyan

    Multilayer coatings are key optical components in the EUV, soft X-ray and X-ray range. At Institute of Precision Optical Engineering (IPOE), the development of multilayer optics has been impelled for their wide applications in X-ray laser, plasma diagnostics, astronomical observation and synchrotron radiation. The paper presents our recent results of periodic multilayers of Mo/Si, Cr/C, Cr/Sc, La/B4C, Mo/B4C, Si/C, Si/SiC, Mg/SiC Mo/Y and Ru/Y. To improve the reflectivity of Ru/Y multilayer mirrors, Mo layers were inserted between Ru and Y layer. The Mo barrier layers suppress intermixing between Ru and Y, thereby increasing the reflectivity of Ru/Y multilayer. We also discuss the application of Mo/Si, Mo/Y, Mo/B4C, La/B4C non-periodic multilayers in EUV broadband polarization measurement.

  19. Amorphous molybdenum silicon superconducting thin films

    NASA Astrophysics Data System (ADS)

    Bosworth, D.; Sahonta, S.-L.; Hadfield, R. H.; Barber, Z. H.

    2015-08-01

    Amorphous superconductors have become attractive candidate materials for superconducting nanowire single-photon detectors due to their ease of growth, homogeneity and competitive superconducting properties. To date the majority of devices have been fabricated using WxSi1-x, though other amorphous superconductors such as molybdenum silicide (MoxSi1-x) offer increased transition temperature. This study focuses on the properties of MoSi thin films grown by magnetron sputtering. We examine how the composition and growth conditions affect film properties. For 100 nm film thickness, we report that the superconducting transition temperature (Tc) reaches a maximum of 7.6 K at a composition of Mo83Si17. The transition temperature and amorphous character can be improved by cooling of the substrate during growth which inhibits formation of a crystalline phase. X-ray diffraction and transmission electron microscopy studies confirm the absence of long range order. We observe that for a range of 6 common substrates (silicon, thermally oxidized silicon, R- and C-plane sapphire, x-plane lithium niobate and quartz), there is no variation in superconducting transition temperature, making MoSi an excellent candidate material for SNSPDs.

  20. Hydrido(hydrosilylene)tungsten complexes: dynamic behavior and reactivity toward acetone.

    PubMed

    Watanabe, Takahito; Hashimoto, Hisako; Tobita, Hiromi

    2012-06-01

    Reaction of a labile tungsten nitrile complex, [(Cp*)W(CO)(2)(NCMe)Me] (Cp*=η(5)-C(5)Me(5)), with H(3)SiC(SiMe(3))(3) gave the hydrido(hydrosilylene) complex [(Cp*)(CO)(2)(H)W=Si(H){C(SiMe(3))(3)}] (1a). The hydrido(silylene) complex [(η(5)-C(5)Me(4)Et)(CO)(2)(H)W=SiMes(2)] (2) (Mes=2,4,6-Me-C(6)H(2)) was synthesized by a similar reaction with H(2)SiMes(2). There is a strong interligand interaction between the hydrido and silylene ligands of these complexes; this was confirmed by a neutron diffraction study of [D(2)]1b, that is, the deuterido and η(5)-C(5)Me(4)Et derivative of 1a. The exchange between the W-H and the Si-D groups was observed in the deuterido complex [D]1a. This H/D exchange proceeded slowly at room temperature, but very rapidly under UV irradiation. Variable-temperature NMR spectroscopy measurements show the dynamic behavior of carbonyl ligands in 1a. Complex 1a reacted with acetone at room temperature to give mainly a hydrosilylation product, [(Cp*)(CO)(2)(H)W=Si(OiPr){C(SiMe(3))(3)}] (3a), along with a siloxy complex, [(Cp*)(CO)(2)WO(Si(H)iPr{C(SiMe(3))(3)})] (4a). At low temperature, a different reaction, namely, α-H abstraction, proceeded to give an equilibrium mixture of 1a and a dihydrido(silyl) complex, [(Cp*)(CO)(2)(H)(2)W(Si(H){OC(=CH(2))Me}{C(SiMe(3))(3)})] (5).

  1. The oxidation behavior of tungsten and germanium alloyed molybdenum disilicide coatings

    SciTech Connect

    Mueller, A.; Wang, Ge; Rapp, R.A. . Dept. of Materials Science and Engineering); Courtright, E.L. ); Kircher, T. . Aerospace Materials Div.)

    1991-11-01

    A two-step coating process was used to produce a (Mo,W)(Si,Ge){sub 2} coating on niobium. After exposure to high temperatures, a lower silicide layer forms underneath and is effective in arresting cracks. The oxidation weight-gain kinetics are parabolic following an initial transient period. Test coupons coated with (Mo,W)(Si,Ge){sub 2} passed 200 one-hour cycles at 1370{degree}C and 60 one-hour cycles at 1540{degree}C. These results, along with evidence of a thick protective glass layer, suggest that the germanium additions help cyclic oxidation resistance. The beneficial effects of the tungsten include the formation of microvoids, which provides a lower effective elastic modulus, and mechanical strengthening. No accelerated low temperature or pest'' oxidation was observed in the temperature range between 500--700{degree}C. Thus, a (Mo,W)(Si,Ge) multicomponent silicide coating offers significant promise for the protection of Nb-base alloys exposed to cyclic oxidizing environments over a broad range of temperatures.

  2. The oxidation behavior of tungsten and germanium alloyed molybdenum disilicide coatings

    SciTech Connect

    Mueller, A.; Wang, Ge; Rapp, R.A.; Courtright, E.L.; Kircher, T.

    1991-11-01

    A two-step coating process was used to produce a (Mo,W)(Si,Ge){sub 2} coating on niobium. After exposure to high temperatures, a lower silicide layer forms underneath and is effective in arresting cracks. The oxidation weight-gain kinetics are parabolic following an initial transient period. Test coupons coated with (Mo,W)(Si,Ge){sub 2} passed 200 one-hour cycles at 1370{degree}C and 60 one-hour cycles at 1540{degree}C. These results, along with evidence of a thick protective glass layer, suggest that the germanium additions help cyclic oxidation resistance. The beneficial effects of the tungsten include the formation of microvoids, which provides a lower effective elastic modulus, and mechanical strengthening. No accelerated low temperature or ``pest`` oxidation was observed in the temperature range between 500--700{degree}C. Thus, a (Mo,W)(Si,Ge) multicomponent silicide coating offers significant promise for the protection of Nb-base alloys exposed to cyclic oxidizing environments over a broad range of temperatures.

  3. Investigation of new material combinations for hard x-ray telescope designs

    NASA Astrophysics Data System (ADS)

    Jensen, C. P.; Madsen, K. K.; Christensen, F. E.

    2006-06-01

    The materials chosen for depth graded multilayer designs for hard x-ray telescopes (10 keV to 80 keV) have until now been focusing on W/Si, W/SiC, Pt/C, and Pt/SiC. These material combinations have been chosen because of good stability over time and low interface roughness, However both W and Pt have absorption edges in the interesting energy range from 70 - 80 keV. If looking at the optical constants Cu and Ni would be good alternative high-Z candidates since the k-absorption edges in Cu and Ni is below 10 keV. We have investigated both of these materials as the reflecting layer in combination with SiC as the spacer layer and give the performance in terms of roughness, minimum obtainable d-spacing and stability over time as deposited in our planar magnetron sputtering facility. Likewise we review the same properties of WC/SiC coatings which we have previously developed and which allow for very small d-spacings. The combination of WC/SiC or the well established W/SiC with the above mentioned Cu and Ni-containing multilayers in the same stack allows for novel telescope designs operating up to and above 100 keV without the absorption edge structure.

  4. Tungsten silicide formation from sequentially sputtered tungsten and silicon films

    NASA Astrophysics Data System (ADS)

    Molarius, J. M.; Franssila, S.; Drozdy, G.; Saarilahti, J.

    1991-11-01

    As-deposited tungsten silicide films have typically high resistivity and require annealing to lower the resistivity to practical values. Rapid thermal annealing (RTA) has emerged as the main method because impurity diffusion in silicides is extremely fast. In this study we have explored the possibility of reducing the required thermal budget for tungsten silicide annealing by sputtering multilayer W /Si films. In addition to direct technological relevance, multilayer structures offer new insights into silicide formation. We propose a hypothesis "oxygen supply to interface ratio" for explaining why multilayer W /Si structures are beneficial for silicide formation. We have prevented the possible oxygen barrier formation at the W /Si interface by diminishing the oxygen supply by several means: substrate heating during deposition, multiple thin layers, a silicon capping layer and argon purging during RTA. Tetragonal WSi 2 is formed at 700°C and no silicon-rich phases are observed. Low-resistivity WSi 2 is produced by RTA at 1000°C, 120 s. Sheet resistance values around 3 ω/□ amends the use of tungsten silicide in practical polycide structures. The ultimate resistivity of our WSi 2, 30 μω · cm, is among the lowest reported for tungsten silicide, and it is achieved in a very straightforward fashion, using typical production equipment.

  5. Concepts for Smart Protective High-Temperature Coatings

    SciTech Connect

    Tortorelli, P.F.; Brady, M.P.; Wright, I.G.

    2003-04-24

    The need for environmental resistance is a critical material barrier to the operation of fossil systems with the improved energy efficiencies and emissions performance described by the goals of the Vision 21 concept of the U.S. Department of Energy's Office of Fossil Energy. All fossil fuel-derived processes contain reactive species and high-temperature degradation arising from reactions of solids with gases and condensible products often limits performance or materials lifetimes such that efficiency, emission, and/or economic targets or requirements are not realized. Therefore, historically, the development of materials for fossil-fuel combustion and conversion systems has been closely linked to corrosion studies of alloys and ceramics in appropriate environments. This project is somewhat different from such studies in that it focuses on the feasibility of new routes to controlling the critical chemical and mechanical phenomena that collectively form the basis for environmental protection in relevant fossil environments by exploring compositional and microstructural manipulations and cooperative phenomena that have not necessarily been examined in any detail to date. This can hopefully lead to concepts for ''smart'' coatings or materials that have the ability to sense and respond appropriately to a particular set or series of environmental conditions in order to provide high-temperature corrosion protection. The strategies being explored involve cooperative or in-place oxidation or sulfidation reactions of multiphase alloys.[1,2] The first material systems to be evaluated involve silicides as there is some evidence that such materials have enhanced resistance in oxidizing-sulfidizing and sulfidizing environments and in air/oxygen at very high temperatures.[3] In this regard, molybdenum silicides may prove to be of particular interest. Molybdenum is known to sulfidize fairly slowly[4] and there has been recent progress in developing Mo-Si-B systems with improved

  6. Experimental Fracture Measurements of Functionally Graded Materials

    NASA Astrophysics Data System (ADS)

    Carpenter, Ray Douglas

    The primary objective of this research was to extend established fracture toughness testing methods to a new class of engineering materials known as functionally graded materials (FGMs). Secondary goals were to compare experimental results to those predicted by finite element models and to provide fracture test results as feedback toward optimizing processing parameters for the in-house synthesis of a MoSi2/SiC FGM. Preliminary experiments were performed on commercially pure (CP) Ti and uniform axial tensile tests resulted in mechanical property data including yield strength, 268 MPa, ultimate tensile strength, 470 MPa and Young's modulus, 110 GPa. Results from 3-point bending fracture experiments on CP Ti demonstrated rising R-curve behavior and experimentally determined JQ fracture toughness values ranged between 153 N/mm and 254 N/mm. Similar experimental protocols were used for fracture experiments on a 7- layered Ti/TiB FGM material obtained from Cercom in Vista, California. A novel technique for pre-cracking in reverse 4-point bending was developed for this ductile/brittle FGM material. Fracture test results exhibited rising R-curve behavior and estimated JQ fracture toughness values ranged from 0.49 N/mm to 2.63 N/mm. A 5- layered MoSi2/SiC FGM was synthesized using spark plasma sintering (SPS). Samples of this material were fracture tested and the results again exhibited a rising R-curve with KIC fracture toughness values ranging from 2.7 MPa-m1/2 to 6.0 MPa-m1/2. Finite Element Models predicted rising R-curve behavior for both of the FGM materials tested. Model results were in close agreement for the brittle MoSi2/SiC FGM. For the relatively more ductile Ti/TiB material, results were in close agreement at short crack lengths but diverged at longer crack lengths because the models accounted for fracture toughening mechanisms at the crack tip but not those acting in the crack wake.

  7. Crack growth in high temperature materials

    SciTech Connect

    Stoloff, N.S.

    1998-12-31

    Many intermetallic compounds are brittle at low temperatures. Some compounds, including NiAl and MoSi, seem to be intrinsically brittle. Other compounds, including Ni{sub 3}Al, FeAl and Fe{sub 3}Al, are reasonably ductile when tested in inert environments. Water and water vapor can severely embrittle these and other compounds because they contain an active element such as aluminum or silicon. The release of atomic hydrogen from water leads, at room temperature, to hydrogen embrittlement. Another source of embrittlement, at elevated temperatures, is oxygen from the atmosphere. The effects of aggressive environments on the crack growth behavior of several intermetallics under monotonic or cyclic loading are described. Alleviation of embrittlement by means of alloying, the use of coatings or by prestrain are described, although no single method is effective for all intermetallics. A brief survey of environmentally induced crack growth in superalloys is included.

  8. Oxidation and corrosion behavior of modified-composition, low-chromium 304 stainless steel alloys

    NASA Technical Reports Server (NTRS)

    Stephens, J. R.; Barrett, C. A.

    1977-01-01

    The effects of substituting less strategic elements than Cr on the oxidation and corrosion resistance of AISI 304 stainless steel were investigated. Cyclic oxidation resistance was evaluated at 870 C. Corrosion resistance was determined by exposure of specimens to a boiling copper-rich solution of copper sulfate and sulfuric acid. Alloy substitutes for Cr included Al, Mn, Mo, Si, Ti, V, Y, and misch metal. A level of about 12% Cr was the minimum amount of Cr required for adequate oxidation and corrosion resistance in the modified composition 304 stainless steels. This represents a Cr saving of at least 33%. Two alloys containing 12% Cr and 2% Al plus 2% Mo and 12% Cr plus 2.65% Si were identified as most promising for more detailed evaluation.

  9. A method for repairing amplitude defects in multilayer-coated EUV mask blanks

    SciTech Connect

    Barty, A; Hau-Riege, S; Stearns, D; Clift, M; Mirkarimi, P; Gullikson, E; Chapman, H; Sweeney, D

    2003-10-20

    EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Localized defects in this thin film coating can significantly perturb the reflected field and produce errors in the printed image. Ideally one would want to manufacture defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to be able to repair a significant number of the defects in the multilayer coating. In this paper we present a method for repairing defects that are near the top surface of the coating; we call these amplitude defects because they predominantly attenuate the amplitude of the reflected field. Although the discussion is targeted to the application of manufacturing masks for EUV lithography, the conclusions and results are also applicable to understanding the optical effects of multilayer erosion, including ion-induced multilayer erosion and condenser erosion in EUVL steppers.

  10. Multilayer-based soft X-ray polarimeter at the Beijing Synchrotron Radiation Facility

    NASA Astrophysics Data System (ADS)

    Sun, Li-Juan; Cui, Ming-Qi; Zhu, Jie; Zhao, Yi-Dong; Zheng, Lei; Wang, Zhan-Shan; Zhu, Jing-Tao

    2013-07-01

    A compact high precision eight-axis automatism and two-axis manual soft-ray polarimeter with a multilayer has been designed, constructed, and installed in 3W1B at the Beijing Synchrotron Radiation Facility (BSRF). Four operational modes in the same device, which are double-reflection, double-transmission, front-reflection-behind-transmission and front-transmission-behind-reflection, have been realized. It can be used for the polarization analysis of synchrotron radiation. It also can be used to characterize the polarization properties of the optical elements in the soft X-ray energy range. Some experiments with Mo/Si and Cr/C multilayers have been performed by using this polarimeter with good results obtained.

  11. X-ray polarimeter with a transmission multilayer.

    PubMed

    Kitamoto, Shunji; Murakami, Hiroshi; Shishido, Youich; Gotoh, Norimitsu; Shibata, Takuma; Saito, Kousuke; Watanabe, Takeshi; Kanai, Jun'ichi; Takenaka, Eri; Nagasaki, Kenta; Yoshida, Masaki; Takei, Dai; Morii, Mikio

    2010-02-01

    We fabricated a novel x-ray polarimeter with a transmission multilayer and measured its performance with synchrotron radiation. A self standing multilayer with seven Mo/Si bilayers was installed with an incident angle of 45 degrees in front of a back-illuminated CCD. The multilayer can be rotated around the normal direction of the CCD keeping an incident angle of 45 degrees. This polarimeter can be easily installed along the optical axis of x-ray optics. By using the CCD as a photon counting detector with a moderate energy resolution, the polarization of photons in a designed energy band can be measured along with the image. At high photon energies, where the multilayer is transparent, the polarimeter can be used for imaging and spectroscopic observations. We confirmed a modulation factor of 45% with 45% and 17% transmission for P- and S-polarization, respectively. PMID:20192483

  12. X-ray polarimeter with a transmission multilayer

    SciTech Connect

    Kitamoto, Shunji; Murakami, Hiroshi; Shishido, Youich; Gotoh, Norimitsu; Shibata, Takuma; Saito, Kousuke; Watanabe, Takeshi; Kanai, Jun'ichi; Takenaka, Eri; Nagasaki, Kenta; Yoshida, Masaki; Takei, Dai; Morii, Mikio

    2010-02-15

    We fabricated a novel x-ray polarimeter with a transmission multilayer and measured its performance with synchrotron radiation. A self standing multilayer with seven Mo/Si bilayers was installed with an incident angle of 45 deg. in front of a back-illuminated CCD. The multilayer can be rotated around the normal direction of the CCD keeping an incident angle of 45 deg. This polarimeter can be easily installed along the optical axis of x-ray optics. By using the CCD as a photon counting detector with a moderate energy resolution, the polarization of photons in a designed energy band can be measured along with the image. At high photon energies, where the multilayer is transparent, the polarimeter can be used for imaging and spectroscopic observations. We confirmed a modulation factor of 45% with 45% and 17% transmission for P- and S-polarization, respectively.

  13. Recent advances and developments in refractory alloys

    SciTech Connect

    Nieh, T.G.; Wadsworth, J.

    1993-11-01

    Refractory metal alloys based on Mo, W, Re, Ta, and Nb (Cb) find applications in a wide range of aerospace applications because of their high melting points and high-temperature strength. This paper, presents recent progress in understanding and applications of these alloys. Recent studies to improve the oxidation and mechanical behavior of refractory metal alloys, and particularly Nb alloys, are also discussed. Some Re structures, for extremely high temperature applications (> 2000C), made by CVD and P/M processes, are also illustrated. Interesting work on the development of new W alloys (W-HfC-X) and the characterization of some commercial refractory metals, e.g., K-doped W, TZM, and Nb-1%Zr, continues. Finally, recent developments in high temperature composites reinforced with refractory metal filaments, and refractory metal-based intermetallics, e.g., Nb{sub 3}Al, Nb{sub 2}Be{sub 17}, and MoSi{sub 2}, are briefly described.

  14. The work function engineering and thermal stability of novel metal gate electrodes for advanced CMOS devices

    NASA Astrophysics Data System (ADS)

    Zhao, Penghui

    The continuous scaling of Complementary Metal Oxide Semiconductor (CMOS) integrated circuits requires the replacement of the conventional poly-silicon gate electrode and silicon dioxide gate dielectric with metal gate electrodes and high-agate dielectrics, respectively. The most critical requirements for alternative metal gates are proper work function and good thermal stability. This dissertation has focused on the effective work function and thermal stability of molybdenum-based metal gates (Mo, MoN, and MoSiN) and fully silicided (FUSI) NiSi metal gates. Capacitance-Voltage (C-V) and Current-Voltage (I-V) measurements of MOS capacitors were performed to investigate the electrical properties of molybdenum-based metal gates. Four-point probe resistivity measurements, Rutherford Backscattering Spectroscopy (RBS), X-ray Photoelectron Spectroscopy (XPS), High Resolution Transmission Electron Microscopy (HR-TEM), Electron Nanodiffraction analysis, X-ray Diffraction (XRD) and backside Secondary Ion Mass Spectroscopy (SIMS) methods were performed as well, to characterize the thermal stability of metal gate electrodes. The effective work function and thermal stability of molybdenum-based metal gates (Mo, MoN and MoSiN) on both SiO2 and Hf-based high-kappadielectrics have been evaluated systematically. The effects of silicon and nitrogen concentrations on the work function and thermal stability are discussed. The effective work function of molybdenum nitrides on both SiO2 and Hf-based high-kappadielectrics can be tuned to ˜4.4-4.5 eV, however, the thermal budgets should be less than 900°C 10 sec due to nitrogen loss and the phase transformation behavior of molybdenum nitrides. Silicon incorporation in the Mo-N system can improve the film thermal stability and diffusion barrier properties at the interface of metal gates/dielectrics due to the presence of Si-N bonds. By optimizing the film composition, the work function of MoSiN gates on SiO2 can be tuned for fully

  15. Ultra-high efficiency multilayer blazed gratings through deposition kinetic control

    SciTech Connect

    Voronov, D. L.; Anderson, Erik H.; Gullikson, Eric M.; Salmassi, Farhad; Warwick, Tony; Yashchuk, Valeriy V.; Padmore, Howard A.

    2012-05-07

    Diffraction efficiency of multilayer coated blazed gratings (MBG) strongly depends on the perfection of the saw-tooth-shaped layers in the overall composite structure. Growth of multilayers on saw-tooth substrates should be carefully optimized in order to reduce groove profile distortion and at the same time to avoid significant roughening of multilayer interfaces. In this work we report on a new way to optimize growth of sputter-deposited Mo/Si multilayers on saw-tooth substrates through variation of the sputtering gas pressure. Lastly, a new record for diffraction efficiency of 44% was achieved for a optimized MBG with groove density of 5250 lines/mm at the wavelength of 13.1 nm.

  16. Property evaluation of thermal sprayed metallic coating by acoustic emission analysis

    SciTech Connect

    Ishida, Asako; Mizutani, Yoshihiro; Takemoto, Mikio; Ono, Kanji

    2000-03-01

    The authors analyzed acoustic emission signals from plasma sprayed sheets by first obtaining the Young's modulus, Poisson's ratio, and density. The sheets of a high Cr-Ni alloy (55Cr-41Ni-Mo, Si, B) were made by low pressure plasma spraying (LPPS) and heat treated. Utilizing laser induced surface acoustic waves (SAWs), the group velocity dispersion data of Rayleigh waves was obtained and matched to that computed by Adler's matrix transfer method. They monitored the acoustic emissions (Lamb waves) produced by microfractures in free standing as sprayed coating subjected to bending. Fast cleavage type microfracture with source rise time of around 2 {micro}s occurred as precursors to the final brittle fracture. The velocity and time-frequency amplitude spectrograms (wavelet contour maps) of the Lamb waves were utilized for the source location and fracture kinetic analyses.

  17. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

    PubMed

    Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

    2003-01-01

    Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the central wavelength of the reflectivity of these mirrors must be measured with a wavelength repeatability of 0.001 nm and the peak reflectivity of the reflective masks with a repeatability of 0.12 %. We report on two upgrades of our NIST/DARPA Reflectometry Facility that have given us the ability to achieve 0.1 % repeatability and 0.3 % absolute uncertainty in our reflectivity measurements. A third upgrade, a monochromator with thermal and mechanical stability for improved wavelength repeatability, is currently in the design phase.

  18. Comparison of the Thermal Expansion Behavior of Several Intermetallic Silicide Alloys Between 293 and 1523 K

    NASA Astrophysics Data System (ADS)

    Raj, S. V.

    2015-03-01

    Thermal expansion measurements were conducted on hot-pressed CrSi2, TiSi2, WSi2 and a two-phase Cr-Mo-Si intermetallic alloy between 303 and 1523 K during three heat-cool cycles. The corrected thermal expansion, (Δ L/ L 0)thermal, varied with the absolute temperature, T, as where, A, B, C, and D are regression constants. Excellent reproducibility was observed for most of the materials after the first heat-up cycle. In some cases, the data from first heat-up cycle deviated from those determined in the subsequent cycles. This deviation was attributed to the presence of residual stresses developed during processing, which are relieved after the first heat-up cycle.

  19. Oxidation behavior of molybdenum silicides and their composites

    SciTech Connect

    Natesan, K.; Deevi, S. C.

    2000-04-03

    A key materials issue associated with the future of high-temperature structural silicides is the resistance of these materials to oxidation at low temperatures. Oxidation tests were conducted on Mo-based silicides over a wide temperature range to evaluate the effects of alloy composition and temperature on the protective scaling characteristics and testing regime for the materials. The study included Mo{sub 5}Si{sub 3} alloys that contained several concentrations of B. In addition, oxidation characteristics of MoSi{sub 2}-Si{sub 3}N{sub 4} composites that contained 20--80 vol.% Si{sub 3}N{sub 4} were evaluated at 500--1,400 C.

  20. Process for producing dispersed particulate composite materials

    DOEpatents

    Henager, Jr., Charles H.; Hirth, John P.

    1995-01-01

    This invention is directed to a process for forming noninterwoven dispersed particulate composite products. In one case a composite multi-layer film product comprises a substantially noninterwoven multi-layer film having a plurality of discrete layers. This noninterwoven film comprises at least one discrete layer of a first material and at least one discrete layer of a second material. In another case the first and second materials are blended together with each other. In either case, the first material comprises a metalloid and the second material a metal compound. At least one component of a first material in one discrete layer undergoes a solid state displacement reaction with at least one component of a second material thereby producing the requisite noninterwoven composite film product. Preferably, the first material comprises silicon, the second material comprises Mo.sub.2 C, the third material comprises SiC and the fourth material comprises MoSi.sub.2.

  1. Materials corrosion and protection from first principles

    NASA Astrophysics Data System (ADS)

    Johnson, Donald F.

    suggests that alloying Fe with Si can be an effective means to limit uptake of these elements into steel. Spallation of protective layers on jet engine turbine blades is a problem that arises during thermal cycling. An alternative thermal barrier coating system involving MoSi2 is considered and calculations predict strong adhesion at the MoSi2/Ni interface. The interfacial bonding structure reveals a mixture of metallic and covalent cross-interface bonds. The adhesion energy is similar across all three MoSi2 facets studied. Upon exposure to oxygen, this MoSi2 alloy will form a strongly adhered oxide scale, which in turn may strongly adhere the heat shield material (yttria-stabilized zirconia), thereby potentially extending the lifetime of the barrier coating. Lastly, the interaction of hydrogen isotopes (fusion fuel) with tungsten (a proposed fusion reactor wall material) is examined. Exothermic dissociative adsorption is predicted, along with endothermic absorption and dissolution. Surface-to-subsurface diffusion energy barriers for H incorporation into bulk W are large and the corresponding outward diffusion barriers are very small. In bulk W, deep energetic traps (trapping multiple H atoms) are predicted at vacancy defects. Thus, under high neutron fluxes that will produce vacancies in W, H are predicted to collect at these vacancies. In turn, locally high concentrations of H at such vacancies will enhance decohesion of bulk W, consistent with observed blistering under deuterium implantation. Limiting vacancy formation may be key to the survival of W as a fusion reactor wall material.

  2. Optics characterization with compact EUV spectrophotometer

    NASA Astrophysics Data System (ADS)

    Blaschke, H.; Balasa, I.; Koch, L.; Starke, K.; Ristau, D.; Wies, C.; Lebert, R.; Bayer, A.; Barkusky, F.; Mann, K.

    2008-03-01

    The development of a novel compact EUV spectrophotometer will be presented. The device is capable of measuring reflectance and transmittance spectra of medium scale EUV-optics primary in the spectral range from 12nm to 21nm. Based on a new polychromatic measurement principle, the system uses the direct irradiation of a table-top EUV-source for illuminating the sample and a broad-band spectrograph for detecting the probe and reference beam. Samples can be investigated under different angles of incidence and in respect of lateral dependencies. Typical results of reflectivity investigations of Mo/Si-mirrors and transmitting foils will be shown and compared with reference measurements of certified institutes and calculations.

  3. Interplay of three-dimensional profile change and CD variation in 193-nm advanced binary photomasks

    NASA Astrophysics Data System (ADS)

    Lin, Yun-Yue; Su, Sean; Hsush, Wen-Chang; Lien, Ta-Cheng; Chen, Jia-Jen; Lee, Shin-Chang; Yen, Anthony

    2012-06-01

    In this study, the relationship between the depth profile of features and critical dimension (CD) deviation on MoSi binary photomasks is comprehensively investigated using 3D atomic force microscopy (3D-AFM) and aerial image metrology system (AIMS). Detailed profile description based on various surface analysis techniques, was performed to reconstruct the profile at various stages of the mask fabrication process. It is found that profile change and sidewall byproduct formation are strongly correlated with the etching environment, wet cleaning, and post-treatment. These process-induced profile changes subsequently lead to wafer CD change which can be verified by deviation in AIMS and CDSEM measurements. Visualization of these 3D profile and morphology change clearly reveals that etching gas control forms an outer layer, to enhance etch selectivity, film strength, and immunity to the mask cleaning process. Our finding provides a direction for optimizing advanced photomask materials and processing.

  4. Stability of EUV multilayer coatings to low energy alpha particles bombardment.

    PubMed

    Nardello, M; Zuppella, Paola; Polito, V; Corso, Alain Jody; Zuccon, Sara; Pelizzo, M G

    2013-11-18

    Future solar missions will investigate the Sun from very close distances and optical components are constantly exposed to low energy ions irradiation. In this work we present the results of a new experiment related to low energy alpha particles bombardments on Mo/Si multilayer optical coatings. Different multilayer samples, with and without a protecting capping layer, have been exposed to low energy alpha particles (4keV), fixing the ions fluency and varying the time of exposure in order to change the total dose accumulated. The experimental parameters have been selected considering the potential application of the coatings to future solar missions. Results show that the physical processes occurred at the uppermost interfaces can strongly damage the structure. PMID:24514344

  5. Role of dynamic effects in the characterization of multilayers by means of power spectral density.

    PubMed

    Haase, Anton; Soltwisch, Victor; Laubis, Christian; Scholze, Frank

    2014-05-10

    In this paper, we present measurements of angle- and wavelength-resolved diffuse scattering of EUV radiation on a Mo/Si multilayer. Our sample is optimized for high reflectivity at 13.5 nm wavelength near-normal incidence. We present a rigorous theoretical analysis of the off-specular EUV scattering on the basis of the distorted-wave Born approximation. We prove that the determination of the interface roughness power spectral density (PSD) is only possible by considering geometry-dependent and dynamic contributions. The scattering from multilayer mirrors leads to an intrinsic enhancement in off-specular intensity independent of roughness properties. The thickness oscillations in the scattering intensity (Kiessig fringes) are found to cause additional dynamic enhancement in analogy to Bragg-like peaks for grazing incidence geometry. Considering these effects, the interface PSD is consistently determined. PMID:24922021

  6. Optimized capping layers for EUV multilayers

    DOEpatents

    Bajt, Sasa; Folta, James A.; Spiller, Eberhard A.

    2004-08-24

    A new capping multilayer structure for EUV-reflective Mo/Si multilayers consists of two layers: A top layer that protects the multilayer structure from the environment and a bottom layer that acts as a diffusion barrier between the top layer and the structure beneath. One embodiment combines a first layer of Ru with a second layer of B.sub.4 C. Another embodiment combines a first layer of Ru with a second layer of Mo. These embodiments have the additional advantage that the reflectivity is also enhanced. Ru has the best oxidation resistance of all materials investigated so far. B.sub.4 C is an excellent barrier against silicide formation while the silicide layer formed at the Si boundary is well controlled.

  7. Molten glass corrosion resistance of immersed combustion-heating tube materials in E-glass

    SciTech Connect

    Sundaram, S.K.; Hsu, J.Y.; Speyer, R.F.

    1995-07-01

    The corrosion resistance of molybdenum, molybdenum disilicide, and a SiC{sub (p)}/Al{sub 2}O{sub 3} composite to molten E-glass at 1,550 C was studied. Mo showed no tendency to oxidize as it was immersed in soda-lime silicate glass in a parallel study. MoSi{sub 2} was corroded by soluble molecular oxygen, leaving a Mo{sub 5}Si{sub 3} interface behind. The SiC{sub (p)}/Al{sub 2}O{sub 3} composite was corroded at a more rapid rate wherein the SiC component was oxidized to form amorphous silica and CO bubbles. Based on these results, the activity of soluble molecular oxygen in E-glass was determined to be in the range of 2.4 {times} 10{sup {minus}14} to 2.0 {times} 10 {sup {minus}8}.

  8. Experimental investigations on the chemical state of solid fission-product elements in U3Si2

    NASA Astrophysics Data System (ADS)

    Ugajin, M.; Itoh, A.

    1994-10-01

    The uranium silicide U3Si2 has a congruent melting point of 1665 C and possesses higher uranium density (11.3 g U/cc) and higher thermal conductivity than the uranium dioxide currently used in light water reactors. U3Si2 is in use as a research reactor fuel (US Nuclear Regulatory Commission, NUREG-1313, July, 1988), representing a potentiality for power reactor fuel. A first attempt is made in this study to predict the chemical state of the solid fission-product elements comprising zirconium, molybdenum, rare earth elements, alkaline earth metals and elements of the platinum group. Ternary phase equilibria in the U-Mo-Si and U-Ru-Si systems are also investigated to supplement the fission product chemistry in U3Si2.

  9. PSM and thin OMOG reticles aerial imaging metrology comparison study

    NASA Astrophysics Data System (ADS)

    Cohen, Yaron; Finders, Jo; Mangan, Shmoolik; Englard, Ilan; Mouraille, Orion; Janssen, Maurice; Miyazaki, Junji; Connolly, Brid; Kojima, Yosuke; Higuchi, Masaru

    2012-02-01

    For sub 20nm features, IC (integrated circuits) designs include an increasing number of features approaching the resolution limits of the scanner compared to the previous generation of IC designs. This trend includes stringent design rules and complex, ever smaller optical proximity correction (OPC) structures. In this regime, a new type of mask, known as opaque MoSi on glass (OMOG), has been introduced to overcome the shortcomings of the well-established phase shift masks (PSM). This paper reviews the fundamental aerial imaging differences between identically designed PSM and thin OMOG masks. The masks were designed for scanner qualification tests and therefore contain large selections of 1D and 2D features, including various biases and OPCs. Aerial critical dimension uniformity (CDU) performance for various features on both masks are reported. Furthermore, special efforts have been made to emphasize the advantages of aerial imaging metrology versus wafer metrology in terms of shortening scanner qualification cycle time.

  10. Aperiodic multilayer structures in soft X-ray radiation optics

    SciTech Connect

    Vishnyakov, E A; Kamenets, F F; Kondratenko, V V; Lugin, M S; Panchenko, A V; Pershin, Yu P; Pirozhkov, A S; Ragozin, Evgenii N

    2012-02-28

    We review the works related to the development of aperiodic multilayer structures - optical elements for the soft X-ray range. The potentialities of aperiodic multilayer mirrors as regards reflection of soft X-ray radiation in a broad wavelength range, first and foremost at normal radiation incidence, as well as the capabilities of broadband polariser mirrors are investigated. The results of multiparametric optimisation and experimental results for Mo/Si aperiodic mirrors ({lambda} {>=} 12.5 nm) as well as calculations for several promising material pairs (Pd/Y, Ag/Y, etc.) for {lambda} {<=} 12.5 nm are outlined. The effect of transition layers on the reflectivity is considered, in particular by taking into account the smooth variation of the permittivity near interfacial boundaries. The use of broadband mirrors in laser-plasma spectroscopic experiments is discussed.

  11. High-temperature oxidation behavior of reaction-formed silicon carbide ceramics

    NASA Technical Reports Server (NTRS)

    Ogbuji, Linus U. J. T.; Singh, M.

    1995-01-01

    The oxidation behavior of reaction-formed silicon carbide (RFSC) ceramics was investigated in the temperature range of 1100 to 1400 C. The oxidation weight change was recorded by TGA; the oxidized materials were examined by light and electron microscopy, and the oxidation product by x-ray diffraction analysis (XRD). The materials exhibited initial weight loss, followed by passive weight gain (with enhanced parabolic rates, k(sub p)), and ending with a negative (logarithmic) deviation from the parabolic law. The weight loss arose from the oxidation of residual carbon, and the enhanced k(sub p) values from internal oxidation and the oxidation of residual silicon, while the logarithmic kinetics is thought to have resulted from crystallization of the oxide. The presence of a small amount of MoSi, in the RFSC material caused a further increase in the oxidation rate. The only solid oxidation product for all temperatures studied was silica.

  12. Growth model of binary alloy nanopowders for thermal plasma synthesis

    NASA Astrophysics Data System (ADS)

    Shigeta, Masaya; Watanabe, Takayuki

    2010-08-01

    A new model is developed for numerical analysis of the entire growth process of binary alloy nanopowders in thermal plasma synthesis. The model can express any nanopowder profile in the particle size-composition distribution (PSCD). Moreover, its numerical solution algorithm is arithmetic and straightforward so that the model is easy to use. By virtue of these features, the model effectively simulates the collective and simultaneous combined process of binary homogeneous nucleation, binary heterogeneous cocondensation, and coagulation among nanoparticles. The effect of the freezing point depression due to nanoscale particle diameters is also considered in the model. In this study, the metal-silicon systems are particularly chosen as representative binary systems involving cocondensation processes. In consequence, the numerical calculation with the present model reveals the growth mechanisms of the Mo-Si and Ti-Si nanopowders by exhibiting their PSCD evolutions. The difference of the materials' saturation pressures strongly affects the growth behaviors and mature states of the binary alloy nanopowder.

  13. Molybdenum-tin as a solar cell metallization system

    NASA Technical Reports Server (NTRS)

    Boyd, D. W.; Radics, C.

    1981-01-01

    The operations of solar cell manufacture are briefly examined. The formation of reliable, ohmic, low-loss, and low-cost metal contacts on solar cells is a critical process step in cell manufacturing. In a commonly used process, low-cost metallization is achieved by screen printing a metal powder-glass frit ink on the surface of the Si surface and the conductive metal powder. A technique utilizing a molybdenum-tin alloy for the metal contacts appears to lower the cost of materials and to reduce process complexity. The ink used in this system is formulated from MoO3 with Sn powder and a trace amount of titanium resonate. Resistive losses of the resulting contacts are low because the ink contains no frit. The MoO3 is finally melted and reduced in forming gas (N2+H2) to Mo metal. The resulting Mo is highly reactive which facilitates the Mo-Si bonding.

  14. Multilayer coatings of 10x projection for extreme-ultraviolet lithography

    SciTech Connect

    Folta, J A; Montcalm, C; Spiller, E; Wedowski, M

    1999-03-09

    Two new sets of projections optics for the prototype 10X reduction EUV lithography system were coated with Mo/Si multilayers. The coating thickness was graded across the optics by using shadow masks to ensure maximum throughput at all incidence angles in the camera. The overall deviation of the (normalized) wavelength response across the clear aperture of each mirror is below 0.01% RMS. However, the wavelength mismatch between two optics coated in different runs is up to 0.07 nm. Nevertheless, this is still within the allowed tolerances, and the predicted optical throughput loss in the camera due to such wavelength mismatch is about 4%. EUV reflectances of 63-65% were measured around 13.40 nm for the secondary optics, which is in good agreement with the expected reflectance based on the substrate finish as measured with AFM.

  15. Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing

    SciTech Connect

    Ray-Chaudhuri, A.K.; Ng, W.; Cerrina, F.; Tan, Z.; Bjorkholm, J.; Tennant, D.; Spector, S.J.

    1995-11-01

    Multilayer-coated imaging systems for extreme ultraviolet (EUV) lithography at 13 nm represent a significant challenge for alignment and characterization. The standard practice of utilizing visible light interferometry fundamentally provides an incomplete picture since this technique fails to account for phase effects induced by the multilayer coating. Thus the development of optical techniques at the functional EUV wavelength is required. We present the development of two EUV optical tests based on Foucault and Ronchi techniques. These relatively simple techniques are extremely sensitive due to the factor of 50 reduction in wavelength. Both techniques were utilized to align a Mo--Si multilayer-coated Schwarzschild camera. By varying the illumination wavelength, phase shift effects due to the interplay of multilayer coating and incident angle were uniquely detected. {copyright} {ital 1995} {ital American} {ital Vacuum} {ital Society}

  16. Software for x-ray optics research instrumentation. Final report, 1991

    SciTech Connect

    Knight, L.V.

    1992-03-01

    The statement of work for this contract between The Regents of the University of California and Brigham Young University called for the implementation of computer controlled substrate motion in an existing DC magnetron sputtering system. This task entailed the design and fabrication of a vacuum compatible motor drive and substrate holder, the system had to be capable of closed loop microcomputer control which required the development of a suitable computer interface and control software. Concurrent with this task, the existing magnetron sputtering system was to be upgraded to permit ion assisted deposition. This required modification of the existing sputtering hardware to permit independent control of voltages applied to the substrate and other additional electrode assemblies. In addition to design, fabrication and installation of the system modifications a systematic study of Mo-Si multilayer coatings grown using ion assisted deposition was undertaken. These studies served, in part, as training of LLNL personnel in the ion assisted deposition technique.

  17. Microstructural and wear properties of sputtered carbides and silicides

    NASA Technical Reports Server (NTRS)

    Spalvins, T.

    1977-01-01

    Sputtered Cr3C2, Cr3Si2, and MoSi2 wear-resistant films (0.05 to 3.5 microns thick) were deposited on metal and glass surfaces. Electron transmission, electron diffraction, and scanning electron microscopy were used to determine the microstructural appearance. Strong adherence was obtained with these sputtered films. Internal stresses and defect crystallographic growth structures of various configurations within the film have progressively more undesirable effects for film thicknesses greater than 1.5 microns. Sliding contact and rolling element bearing tests were performed with these sputtered films. Bearings sputtered with a duplex coating (0.1-micron-thick undercoating of Cr3Si2 and subsequently 0.6-micron coating of MoS2) produced marked improvement over straight MoS2 films.

  18. CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES: First-Principles Calculations of Elastic and Thermal Properties of Molybdenum Disilicide

    NASA Astrophysics Data System (ADS)

    Zhu, Zun-Lue; Fu, Hong-Zhi; Sun, Jin-Feng; Liu, Yu-Fang; Shi, De-Heng; Xu, Guo-Liang

    2009-08-01

    The first-principles plane-wave pseudopotential method using the generalized gradient approximation within the framework of density functional theory is applied to anaylse the equilibrium lattice parameters, six independent elastic constants, bulk moduli, thermal expansions and heat capacities of MoSi2. The quasi-harmonic Debye model, using a set of total energy versus cell volume obtained with the plane-wave pseudopotential method, is applied to the study of the elastic properties, thermodynamic properties and vibrational effects. The calculated zero pressure elastic constants are in overall good agreement with the experimental data. The calculated heat capacities and the thermal expansions agree well with the observed values under ambient conditions and those calculated by others. The results show that the temperature has hardly any effect under high pressure.

  19. Precipitation of Laves phase in a 28%Cr-4%Ni-2%Mo-Nb superferritic stainless steel

    SciTech Connect

    Fontoura de Andrade, Thiago; Madeira Kliauga, Andrea; Plaut, Ronald Lesley; Padilha, Angelo Fernando

    2008-05-15

    The main objective of the present work was to study the precipitation of the Laves phase in the X1 CrNiMoNb 28 4 2 (Werkstoff-Nr. DIN 1.4575) superferritic stainless steel employing several complementary techniques of microstructural analysis. The phase that precipitated in largest quantity in the DIN 1.4575 steel was the sigma ({sigma}) phase. However, along grain boundaries, after aging at 850 deg. C, a Laves phase of the MgZn{sub 2} type, with a hexagonal C14 crystal structure and chemical composition (Fe,Cr,Ni){sub 2}(Nb,Mo,Si), was also identified. Growth of the Laves phase is curtailed by exhaustion of niobium of the matrix and by the presence of the sigma phase, which also precipitates in the vicinity of the grain boundaries, however in larger amounts. No chi ({chi}) or austenite phases were detected in the temperature range studied.

  20. Mechanical properties and oxidation and corrosion resistance of reduced-chromium 304 stainless steel alloys

    NASA Technical Reports Server (NTRS)

    Stephens, J. R.; Barrett, C. A.; Gyorgak, C. A.

    1979-01-01

    An experimental program was undertaken to identify effective substitutes for part of the Cr in 304 stainless steel as a method of conserving the strategic element Cr. Although special emphasis was placed on tensile properties, oxidation and corrosion resistance were also examined. Results indicate that over the temperature range of -196 C to 540 C the yield stress of experimental austenitic alloys with only 12 percent Cr compare favorably with the 18 percent Cr in 304 stainless steel. Oxidation resistance and in most cases corrosion resistance for the experimental alloys were comparable to the commercial alloy. Effective substitutes for Cr included Al, Mo, Si, Ti, and V, while Ni and Mn contents were increased to maintain an austenitic structure.

  1. Effects of post-weld heat treatment on microstructure and mechanical properties of laser welds in GH3535 superalloy

    NASA Astrophysics Data System (ADS)

    Yu, Kun; Jiang, Zhenguo; Leng, Bin; Li, Chaowen; Chen, Shuangjian; Tao, Wang; Zhou, Xingtai; Li, Zhijun

    2016-07-01

    In this study, the microstructure and mechanical properties of laser welds before and after post-weld heat treatment processes were studied. The results show that the tensile strength of the joints can be increased by 90 MPa by a post-weld heat treatment process at 871 °C for 6 h, exceeding the strength of the original state of the base metal. Besides, elongation of the joints are also increased to 43% by the process, whereas the elongation of as-welded joints are only 22%. In addition, the Charpy impact properties of laser welds almost do not change. Second phase precipitates, which were identified as Mo-Si rich M6C-type carbides by transmission electron diffraction and scanning electron microscope, were observed at solidification grain boundaries and solidification subgrain boundaries. These carbides can pin dislocations during the following tensile deformation, hence are responsible for the strengthening of tensile properties of the joints.

  2. Microstructure Characterization of RERTR Fuel

    SciTech Connect

    J. Gan; B. D. Miller; D. D. Keiser; T. R. Allen; D. M. Wachs

    2008-09-01

    A variety of phases have the potential to develop in the irradiated fuels for the reduced enrichment research test reactor (RERTR) program. To study the radiation stability of these potential phases, three depleted uranium alloys were cast. The phases of interest were identified including U(Si,Al)3, (U,Mo)(Si,Al)3, UMo2Al20, UAl4, and U6Mo4Al43. These alloys were irradiated with 2.6 MeV protons at 200ºC up to 3.0 dpa. The microstructure is characterized using SEM and TEM. Microstructural characterization for an archive dispersion fuel plate (U-7Mo fuel particles in Al-2%Si cladding) was also carried out. TEM sample preparation for the irradiated dispersion fuel has been developed.

  3. 5000 groove/mm multilayer-coated blazed grating with 33percent efficiency in the 3rd order in the EUV wavelength range

    SciTech Connect

    Advanced Light Source; Voronov, Dmitriy L.; Anderson, Erik; Cambie, Rossana; Salmassi, Farhad; Gullikson, Eric; Yashchuk, Valeriy; Padmore, Howard; Ahn, Minseung; Chang, Chih-Hao; Heilmann, Ralf; Schattenburg, Mark

    2009-07-07

    We report on recent progress in developing diffraction gratings which can potentially provide extremely high spectral resolution of 105-106 in the EUV and soft x-ray photon energy ranges. Such a grating was fabricated by deposition of a multilayer on a substrate which consists ofa 6-degree blazed grating with a high groove density. The fabrication of the substrate gratings was based on scanning interference lithography and anisotropic wet etch of silicon single crystals. The optimized fabrication process provided precise control of the grating periodicity, and the grating groove profile, together with very short anti-blazed facets, and near atomically smooth surface blazed facets. The blazed grating coated with 20 Mo/Si bilayers demonstrated a diffraction efficiency in the third order as high as 33percent at an incidence angle of 11? and wavelength of 14.18 nm.

  4. Friction and wear properties of three hard refractory coatings applied by radiofrequency sputtering

    NASA Technical Reports Server (NTRS)

    Brainard, W. A.

    1977-01-01

    The adherence, friction, and wear properties of thin hard refractory compound coatings applied to 440C bearing steel by radiofrequency sputtering were investigated. Friction and wear tests were done with nonconforming pin on disk specimens. The compounds examined were chromium carbide, molybdenum silicide, and titanium carbide. The adherence, friction, and wear were markedly improved by the application of a bias voltage to the bearing steel substrate during coating deposition. Analysis by X-ray photoelectron spectroscopy indicated that the improvement may be due to a reduction in impurities in bias deposited coatings. A fivefold reduction in oxygen concentration in MoSi2 coating by biasing was noted. Chromium carbide was not effective as an antiwear coating. Molybdenum silicide provided some reduction in both friction and wear. Titanium carbide exhibited excellent friction and antiwear properties at light loads. Plastic flow and transfer of the coating material onto the pin specimen appears to be important in achieving low friction and wear.

  5. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

    SciTech Connect

    Soufli, R; Hudyma, R M; Spiller, E; Gullikson, E M; Schmidt, M A; Robinson, J C; Baker, S L; Walton, C C; Taylor, J S

    2007-01-03

    This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.

  6. In-line phase retarder and polarimeter for conversion of linear to circular polarization

    SciTech Connect

    Kortright, J.B.; Smith, N.V.; Denlinger, J.D.

    1997-04-01

    An in-line polarimeter including phase retarder and linear polarizer was designed and commissioned on undulator beamline 7.0 for the purpose of converting linear to circular polarization for experiments downstream. In commissioning studies, Mo/Si multilayers at 95 eV were used both as the upstream, freestanding phase retarder and the downstream linear polarized. The polarization properties of the phase retarder were characterized by direct polarimetry and by collecting MCD spectra in photoemission from Gd and other magnetic surfaces. The resonant birefringence of transmission multilayers results from differing distributions of s- and p-component wave fields in the multilayer when operating near a structural (Bragg) interference condition. The resulting phase retardation is especially strong when the interference is at or near the Brewster angle, which is roughly 45{degrees} in the EUV and soft x-ray ranges.

  7. Growth model of binary alloy nanopowders for thermal plasma synthesis

    SciTech Connect

    Shigeta, Masaya; Watanabe, Takayuki

    2010-08-15

    A new model is developed for numerical analysis of the entire growth process of binary alloy nanopowders in thermal plasma synthesis. The model can express any nanopowder profile in the particle size-composition distribution (PSCD). Moreover, its numerical solution algorithm is arithmetic and straightforward so that the model is easy to use. By virtue of these features, the model effectively simulates the collective and simultaneous combined process of binary homogeneous nucleation, binary heterogeneous cocondensation, and coagulation among nanoparticles. The effect of the freezing point depression due to nanoscale particle diameters is also considered in the model. In this study, the metal-silicon systems are particularly chosen as representative binary systems involving cocondensation processes. In consequence, the numerical calculation with the present model reveals the growth mechanisms of the Mo-Si and Ti-Si nanopowders by exhibiting their PSCD evolutions. The difference of the materials' saturation pressures strongly affects the growth behaviors and mature states of the binary alloy nanopowder.

  8. Nanoamorphous carbon-based photonic crystal infrared emitters

    DOEpatents

    Norwood, Robert A.; Skotheim, Terje

    2011-12-13

    Provided is a tunable radiation emitting structure comprising: a nanoamorphous carbon structure having a plurality of relief features provided in a periodic spatial configuration, wherein the relief features are separated from each other by adjacent recessed features, and wherein the nanoamorphous carbon comprises a total of from 0 to 60 atomic percent of one or more dopants of the dopant group consisting of: transition metals, lanthanoids, electro-conductive carbides, silicides and nitrides. In one embodiment, a dopant is selected from the group consisting of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, La and other lanthanides, Hf, Ta, W, Rh, Os, Ir, Pt, Au, and Hg. In one embodiment, a dopant is selected from the group consisting of: electro-conductive carbides (like Mo.sub.2C), silicides (like MoSi.sub.2) and nitrides (like TiN).

  9. EUV light source with high brightness at 13.5 nm

    SciTech Connect

    Borisov, V M; Prokof'ev, A V; Khristoforov, O B; Koshelev, K N; Khadzhiyskiy, F Yu

    2014-11-30

    The results of the studies on the development of a highbrightness radiation source in the extreme ultraviolet (EUV) range are presented. The source is intended for using in projection EUV lithography, EUV mask inspection, for the EUV metrology, etc. Novel approaches to creating a light source on the basis of Z-pinch in xenon allowed the maximal brightness [130 W(mm{sup 2} sr){sup -1}] to be achieved in the vicinity of plasma for this type of radiation sources within the 2% spectral band centred at the wavelength of 13.5 nm that corresponds to the maximal reflection of multilayer Mo/Si mirrors. In this spectral band the radiation power achieves 190 W in the solid angle of 2π at a pulse repetition rate of 1.9 kHz and an electric power of 20 kW, injected into the discharge. (laser applications and other topics in quantum electronics)

  10. A New Method of Metallization for Silicon Solar Cells

    NASA Technical Reports Server (NTRS)

    Macha, M.

    1979-01-01

    The determination of the firing cycle in a horizontal tube furnace for MoO3: Sn ink composition applied by silk screening process on P or N structured solar cells is presented. In comparison with the strip heater used to determine the reaction mechanism, the reduction of MoO3 in the tube furnace progresses at a much faster rate and the Sn:Mo alloy forms at a much lower temperature. The device characteristics determined by the V-I curve showed a high resistance (approx. 10 Ohms) at peak temperatures between 600 C and 800 C. The high series resistance is attributed to the lack of formation of MoSi2 within the used temperature range.

  11. Surface Engineering of Mo-Base Alloys for Elevated-Temperature Environmental Resistance

    NASA Astrophysics Data System (ADS)

    Perepezko, J. H.

    2015-07-01

    The synthesis of robust coatings that provide protection against environmental attack at ultrahigh temperatures is a difficult challenge. To achieve this goal for Mo-base alloys, the fundamental concepts of reactive diffusion pathway analysis and kinetic biasing are used to design a multilayer Mo-Si-B-base coating with a phase sequencing that allows for structural and thermodynamic compatibility and an underlying diffusion barrier to maintain coating integrity. The coating design concepts have a general applicability. The coating structure evolution during high-temperature exposure facilitates a prolonged lifetime as well as self-healing capability. The borosilicide coatings that can be synthesized by a pack cementation process yield superior environmental resistance for Mo-base systems at temperatures up to at least 1,700°C and can be adapted to apply to other refractory metal and ceramic systems.

  12. M5Si3(M=Ti, Nb, Mo) Based Transition-Metal Silicides for High Temperature Applications

    SciTech Connect

    Tang, Zhihong

    2007-01-01

    Transition metal silicides are being considered for future engine turbine components at temperatures up to 1600 C. Although significant improvement in high temperature strength, room temperature fracture toughness has been realized in the past decade, further improvement in oxidation resistance is needed. Oxidation mechanism of Ti5Si3-based alloys was investigated. Oxidation behavior of Ti5Si3-based alloy strongly depends on the atmosphere. Presence of Nitrogen alters the oxidation behavior of Ti5Si3 by nucleation and growth of nitride subscale. Ti5Si3.2and Ti5Si3C0.5 alloys exhibited an excellent oxidation resistance in nitrogen bearing atmosphere due to limited dissolution of nitrogen and increased Si/Ti activity ratio. MoSi2 coating developed by pack cementation to protect Mo-based Mo-Si-B composites was found to be effective up to 1500 C. Shifting coating composition to T1+T2+Mo3Si region showed the possibility to extend the coating lifetime above 1500 C by more than ten times via formation of slow growing Mo3Si or T2 interlayer without sacrificing the oxidation resistance of the coating. The phase equilibria in the Nb-rich portion of Nb-B system has been evaluated experimentally using metallographic analysis and differential thermal analyzer (DTA). It was shown that Nbss (solid solution) and NbB are the only two primary phases in the 0-40 at.% B composition range, and the eutectic reaction L {leftrightarrow} NbSS + NbB was determined to occur at 2104 ± 5 C by DTA.

  13. Effectiveness of Diffusion Barrier Coatings for Mo-Re Embedded in C/SiC and C/C

    NASA Technical Reports Server (NTRS)

    Glass, David E.; Shenoy, Ravi N.; Wang, Zeng-Mei; Halbig, Michael C.

    2001-01-01

    Advanced high-temperature cooling applications may often require the elevated-temperature capability of carbon/silicon carbide or carbon/carbon composites in combination with the hermetic capability of metallic tubes. In this paper, the effects of C/SiC and C/C on tubes fabricated from several different refractory metals were evaluated. Though Mo, Nb, and Re were evaluated in the present study, the primary effort was directed toward two alloys of Mo-Re, namely, arc cast Mo-41Re and powder metallurgy Mo-47.5Re. Samples of these refractory metals were subjected to either the PyC/SiC deposition or embedding in C/C. MoSi2(Ge), R512E, and TiB2 coatings were included on several of the samples as potential diffusion barriers. The effects of the processing and thermal exposure on the samples were evaluated by conducting burst tests, microhardness surveys, and scanning electron microscopic examination (using either secondary electron or back scattered electron imaging and energy dispersive spectroscopy). The results showed that a layer of brittle Mo-carbide formed on the substrates of both the uncoated Mo-41Re and the uncoated Mo-47.5Re, subsequent to the C/C or the PyC/SiC processing. Both the R512E and the MoSi2(Ge) coatings were effective in preventing not only the diffusion of C into the Mo-Re substrate, but also the formation of the Mo-carbides. However, none of the coatings were effective at preventing both C and Si diffusion without some degradation of the substrate.

  14. Characterization and Hydrodesulfurization Properties of Catalysts Derived from Amorphous Metal-Boron Materials

    SciTech Connect

    Parks,G.; Pease, M.; Burns, A.; Layman, K.; Bussell, M.; Wang, X.; Hanson, J.; Rodriquez, J.

    2007-01-01

    Unsupported and silica-supported amorphous metal-boron materials (Ni-B, Mo-O-B, and Ni-Mo-O-B) were prepared by NaBH{sub 4} reduction of aqueous or impregnated metal salts. The resulting materials were characterized by a range of techniques, including conventional and time-resolved X-ray diffraction. The latter technique was used to determine the onset of crystallization of the amorphous materials during annealing in He flow and to identify the phases formed. Annealing of unsupported Ni-B resulted in the crystallization of predominantly Ni{sub 3}B, followed by Ni metal, whereas Ni-B/SiO{sub 2} formed Ni and then NiO. There was no evidence for crystallization of B-containing phases for Mo-O-B or Mo-O-B/SiO{sub 2} on annealing; instead, the predominant phase formed was MoO{sub 2}. In general, the phases formed for Ni-Mo-O-B and Ni-Mo-O-B/SiO2 were consistent with those formed in the monometallic materials, but at higher annealing temperatures. Catalysts prepared by sulfiding Ni-B/SiO{sub 2} and Ni-Mo-O-B/SiO{sub 2} materials had significantly higher thiophene HDS activities than conventionally prepared sulfided Ni/SiO2 and Ni-Mo/SiO{sub 2} catalysts, whereas a sulfided Mo-O-B/SiO{sub 2} catalyst had a dramatically lower HDS activity than a sulfided Mo/SiO{sub 2} catalyst.

  15. Innovative multilayer coatings for space solar physics: performances and stability over time

    NASA Astrophysics Data System (ADS)

    Zuppella, Paola; Corso, Alain J.; Nicolosi, Piergiorgio; Windt, David L.; Pelizzo, Maria G.

    2011-05-01

    Different solar mission are in progress and others are foreseen in the next future to study the structure and the dynamics of the Sun and its interaction with the Earth. Different instruments devoted to solar physics are required to have high reflecting MultiLayers (MLs) coatings. For example, the Multi Element Telescope for Imaging and Spectroscopy (METIS) coronograph will fly on board of SOLar Orbiter (SOLO) mission to perform simultaneous observation at 30.4 nm (He - II Lyman - α line), 121.6 nm (H - I Lyman - α line) and in the visible range, therefore its optics will require high performances in a wide spectral region. It should be desirable to reach higher reflectivity as well as long term stability and lifetime, then different candidate coatings will be considered. The Sounding - Rocket Coronographic Experiment (SCORE) is a prototype of METIS equipped with Mg/SiC optics and it has flown on board of a NASA sounding rocket. The Mg/SiC multilayers offer good performances in terms of reflectivity, but the long term stability and the lifetime have been preliminary investigated and there are open problems to be further studied. Besides standard Mo/Si multilayer, a possible alternative is represented by new multilayer structures based on well known Mo/Si stack in which the performances have been improved by superimposing innovative capping layers. Another alternative is represented by a recently developed multilayer based on an Ir/Si material couple. In this paper we review and compare the performances of such multilayer in all the spectral ranges of interest for SOLO.

  16. Advanced repair solution of clear defects on HTPSM by using nanomachining tool

    NASA Astrophysics Data System (ADS)

    Lee, Hyemi; Kim, Munsik; Jung, Hoyong; Kim, Sangpyo; Yim, Donggyu

    2015-10-01

    As the mask specifications become tighter for low k1 lithography, more aggressive repair accuracy is required below sub 20nm tech. node. To meet tight defect specifications, many maskshops select effective repair tools according to defect types. Normally, pattern defects are repaired by the e-beam repair tool and soft defects such as particles are repaired by the nanomachining tool. It is difficult for an e-beam repair tool to remove particle defects because it uses chemical reaction between gas and electron, and a nanomachining tool, which uses physical reaction between a nano-tip and defects, cannot be applied for repairing clear defects. Generally, film deposition process is widely used for repairing clear defects. However, the deposited film has weak cleaning durability, so it is easily removed by accumulated cleaning process. Although the deposited film is strongly attached on MoSiN(or Qz) film, the adhesive strength between deposited Cr film and MoSiN(or Qz) film becomes weaker and weaker by the accumulated energy when masks are exposed in a scanner tool due to the different coefficient of thermal expansion of each materials. Therefore, whenever a re-pellicle process is needed to a mask, all deposited repair points have to be confirmed whether those deposition film are damaged or not. And if a deposition point is damaged, repair process is needed again. This process causes longer and more complex process. In this paper, the basic theory and the principle are introduced to recover clear defects by using nanomachining tool, and the evaluated results are reviewed at dense line (L/S) patterns and contact hole (C/H) patterns. Also, the results using a nanomachining were compared with those using an e-beam repair tool, including the cleaning durability evaluated by the accumulated cleaning process. Besides, we discuss the phase shift issue and the solution about the image placement error caused by phase error.

  17. Laser-written binary OMOG photomasks for high-volume non-critical 193-nm photolithographic layers

    NASA Astrophysics Data System (ADS)

    Rivière, Rémi; Gopalakrishnan, Selvi; Mazur, Martin; Öner, Nevzat; Mühle, Sven; Seltmann, Rolf

    2014-10-01

    Photomasks are key elements of photolithographic processes, implying that their degradation must be reliably monitored and strongly mitigated. Indeed, the photo-induced oxidation of Cr in Cr On Glass (COG) photomasks and the concomitant electrostatic-field migration present in high-volume production using 193-nm photolithographic scanners severely deteriorate the pattern transfer quality, therefore limiting the lifetime of these reticles. To moderate this effect, Opaque MoSi On Glass (OMOG) photomasks, significantly less prone to such degradation, are currently being massively used in leading-edge microfabrication flows. The type of mask fabrication process normally used involving ebeam writing is however not adapted for non-critical photolithographic layers that do not yet benefit from its inherent performances but still suffer from its high cost and its long processing time. It is therefore proposed in this work to combine the simplicity of laser writing and the resistance of MoSi to degradation by using laser-written binary OMOG photomasks for the non-critical layers (e.g. ion-implantation) of a 28-nm production flow. To evaluate one of this new reticle, its pattern transfer fidelity is compared to the one of a laser-written binary COG mask already qualified for production from a photolithographic quality perspective, both masks being treated using the same optical proximity correction (OPC) model. Dispersive and dissipative properties, critical dimension uniformity, pattern linearity and pattern proximity are directly measured on wafer level, subsequently revealing that both photomasks match in terms of OPC parameters. The utilized OPC model is moreover proven robust against the use of both types of masks, consequently making the conversion from COG to OMOG particularly simple. These experimental results therefore qualify the new mask fabrication type and pave the way for a major utilization in high-volume production.

  18. Laser-plasma SXR/EUV sources: adjustment of radiation parameters for specific applications

    NASA Astrophysics Data System (ADS)

    Bartnik, A.; Fiedorowicz, H.; Fok, T.; Jarocki, R.; Kostecki, J.; Szczurek, A.; Szczurek, M.; Wachulak, P.; Wegrzyński, Ł.

    2014-12-01

    In this work soft X-ray (SXR) and extreme ultraviolet (EUV) laser-produced plasma (LPP) sources employing Nd:YAG laser systems of different parameters are presented. First of them is a 10-Hz EUV source, based on a double-stream gaspuff target, irradiated with the 3-ns/0.8J laser pulse. In the second one a 10 ns/10 J/10 Hz laser system is employed and the third one utilizes the laser system with the pulse shorten to approximately 1 ns. Using various gases in the gas puff targets it is possible to obtain intense radiation in different wavelength ranges. This way intense continuous radiation in a wide spectral range as well as quasi-monochromatic radiation was produced. To obtain high EUV or SXR fluence the radiation was focused using three types of grazing incidence collectors and a multilayer Mo/Si collector. First of them is a multfoil gold plated collector consisted of two orthogonal stacks of ellipsoidal mirrors forming a double-focusing device. The second one is the ellipsoidal collector being part of the axisymmetrical ellipsoidal surface. Third of the collectors is composed of two aligned axisymmetrical paraboloidal mirrors optimized for focusing of SXR radiation. The last collector is an off-axis ellipsoidal multilayer Mo/Si mirror allowing for efficient focusing of the radiation in the spectral region centered at λ = 13.5 ± 0.5 nm. In this paper spectra of unaltered EUV or SXR radiation produced in different LPP source configurations together with spectra and fluence values of focused radiation are presented. Specific configurations of the sources were assigned to various applications.

  19. TOPICAL REVIEW: Quantum suppression of superconductivity in nanowires

    NASA Astrophysics Data System (ADS)

    Bezryadin, Alexey

    2008-01-01

    It is of fundamental importance to establish whether there is a limit to how thin a superconducting wire can be, while retaining its superconducting character—and if there is such limit, to understand what determines it. This issue may be of practical importance in defining the limit to miniaturization of superconducting electronic circuits. Recently, a new fabrication method, called molecular templating, was developed and used to answer such questions. In this approach, a suspended carbon nanotube is coated with a thin superconducting metal film, thus forming a superconducting nanowire. The wire obtained is automatically attached to the two leads formed by the sides of the trench. The usual material for such wires is the amorphous alloy of MoGe (Graybeal 1985 PhD Thesis Stanford University; Graybeal and Beasley 1984 Phys. Rev. B 29 4167; Yazdani and Kapitulnik 1995 Phys. Rev. Lett. 74 3037; Turneaure et al 2000 Phys. Rev. Lett. 84 987). Such wires typically exhibit a high degree of homogeneity and can be made very small: as thin as ~5 nm in diameter and as short as ~40 nm in length. The results of transport measurements on such homogeneous wires can be summarized as follows. Short wires, shorter than some empirical length, ~200 nm for MoGe, exhibit a clear dichotomy. They show either a superconducting behavior, with the resistance controlled by thermal fluctuations, or a weakly insulating behavior, with the resistance controlled by the weak Coulomb blockade. Thus a quantum superconductor-insulator transition (SIT) is indicated. Longer wires exhibit a gradual crossover behavior, from almost perfectly superconducting to normal or weakly insulating behavior, as their diameter is reduced. Measurements of wires, which are made inhomogeneous (granular) on purpose, show that such wires, even if they are short in the sense stated above, do not show a clear dichotomy, which could be identified as an SIT (Bollinger et al 2004 Phys. Rev. B 69 180503(R)). Thus

  20. Method of improving field emission characteristics of diamond thin films

    DOEpatents

    Krauss, Alan R.; Gruen, Dieter M.

    1999-01-01

    A method of preparing diamond thin films with improved field emission properties. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display.

  1. Method of improving field emission characteristics of diamond thin films

    DOEpatents

    Krauss, A.R.; Gruen, D.M.

    1999-05-11

    A method of preparing diamond thin films with improved field emission properties is disclosed. The method includes preparing a diamond thin film on a substrate, such as Mo, W, Si and Ni. An atmosphere of hydrogen (molecular or atomic) can be provided above the already deposited film to form absorbed hydrogen to reduce the work function and enhance field emission properties of the diamond film. In addition, hydrogen can be absorbed on intergranular surfaces to enhance electrical conductivity of the diamond film. The treated diamond film can be part of a microtip array in a flat panel display. 3 figs.

  2. Nose-Cone Calorimeter: upgrade of PHENIX detector

    NASA Astrophysics Data System (ADS)

    Chvala, Ondrej

    2008-10-01

    PHENIX experiment at RHIC is efficient at measuring processes involving rare probes, but has limited acceptance in azimuth and pseudorapidity (η). The Nose Cone Calorimeter (NCC), a W-Si sampling calorimeter in the region of 0.9,<η<,, is one of the upgrades which will dramatically increase coverage in azimuth and pseudorapidity. The NCC will expand PHENIX's precision measurements of electromagnetic probes in η, reconstruct jets, and enhance triggering capabilities. It will significantly contribute to measurements of γ-jets, quarkonia, and low-x nuclear structure functions. Details of the detector design, performance, and a sample of the physics topics which will benefit from the NCC, will be discussed.

  3. X-ray supermirrors for BESSY II

    SciTech Connect

    Erko, A.; Schaefers, F.; Vidal, B.; Yakshin, A.; Pietsch, U.; Mahler, W.

    1995-10-01

    X-ray multilayer supermirrors for the energy range up to 20 keV have been theoretically studied and experimentally measured with synchrotron radiation. A multilayer mirror with 50 W/Si bilayers with different thicknesses on the Si substrate has a smooth reflectivity of up to 32% in the whole energy range from 5 to 22 keV at a grazing incidence angle of 0.32{degree} which is considerably larger than using total external reflection. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

  4. The effect of SiO2 nanoparticles dispersion on physico-chemical properties of modified Ni-W nanocomposite coatings

    NASA Astrophysics Data System (ADS)

    Sassi, W.; Dhouibi, L.; Berçot, P.; Rezrazi, M.

    2015-01-01

    In this work, we study the effect of pH on morphology, composition and crystallographic orientation during pulse electroplating of Ni-W/SiO2 nanocomposite coating from citrate-ammonia media. SEM and AFM analysis shows that the nanocomposite coatings obtained with well dispersed SiO2 nanoparticles were smoother, more compact and with finer grain size. Furthermore, XPS, GDOES and XRD reveal a good crystalline structure with the detection of new intermetallic phases. The interface electrochemical behavior and stability of the studied coatings into 3% NaCl media were discussed in the consideration of electrical conductivity and microhardness.

  5. Quantum creep in a highly crystalline two-dimensional superconductor

    NASA Astrophysics Data System (ADS)

    Saito, Yu; Kasahara, Yuichi; Ye, Jianting; Iwasa, Yoshihiro; Nojima, Tsutomu

    Conventional studies on quantum phase transitions, especially on superconductor-insulator or superconductor-metal-insulator transitions have been performed in deposited metallic thin films such as Bismuth or MoGe. Although the techniques of thin films deposition have been considerably improved, unintentional disorder such as impurities and deficiencies, generating the pinning centers, seems to still exist in such systems. The mechanical exfoliated highly crystalline two-dimensional material can be a good candidate to realize a less-disordered 2D superconductor with extremely weak pinning, combined with transfer method or ionic-liquid gating. We report on the quantum metal, namely, magnetic-field-induced metallic state observed in an ion-gated two-dimensional superconductor based on an ultra-highly crystalline layered band insulator, ZrNCl. We found that the superconducting state is extremely fragile against external magnetic fields; that is, zero resistance state immediately disappears, once an external magnetic field switches on. This is because the present system is relatively clean and the pinning potential is extremely weak, which cause quantum tunneling and flux flow of vortices, resulting in metallic ground state.

  6. Superconductor-Metal-Insulator transition in two dimensional Ta thin Films

    NASA Astrophysics Data System (ADS)

    Park, Sun-Gyu; Kim, Eunseong

    2013-03-01

    Superconductor-insulator transition has been induced by tuning film thickness or magnetic field. Recent electrical transport measurements of MoGe, Bi, Ta thin films revealed an interesting intermediate metallic phase which intervened superconducting and insulating phases at certain range of magnetic field. Especially, Ta thin films show the characteristic IV behavior at each phase and the disorder tuned intermediate metallic phase [Y. Li, C. L. Vicente, and J. Yoon, Physical Review B 81, 020505 (2010)]. This unexpected metallic phase can be interpreted as a consequence of vortex motion or contribution of fermionic quasiparticles. In this presentation, we report the scaling behavior during the transitions in Ta thin film as well as the transport measurements in various phases. Critical exponents v and z are obtained in samples with wide ranges of disorder. These results reveal new universality class appears when disorder exceeds a critical value. Dynamical exponent z of Superconducting sample is found to be 1, which is consistent with theoretical prediction of unity. z in a metallic sample is suddenly increased to be approximately 2.5. This critical exponent is much larger than the value found in other system and theoretical prediction. We gratefully acknowledge the financial support by the National Research Foundation of Korea through the Creative Research Initiatives.

  7. Quantum melting of a two-dimensional vortex lattice at zero temperature

    SciTech Connect

    Rozhkov, A.; Stroud, D.

    1996-11-01

    We consider the quantum melting of a two-dimensional flux lattice at temperature {ital T} = 0 in the {open_quote}{open_quote}superclean limit.{close_quote}{close_quote} In this regime, we find that vortex motion is dominated by the Magnus force. A Lindemann criterion predicts melting when {ital n}{sub {ital v}}/{ital n}{sub {ital p}}{ge}{beta}, where {ital n}{sub {ital v}} and {ital n}{sub {ital p}} are the areal number densities of vortex pancakes and Cooper pairs, and {beta}{approx_equal}0.1. A second criterion is derived by using Wigner-crystal and Laughlin wave functions for the solid and liquid phases respectively, and setting the two energies equal. This gives a melting value similar to the Lindemann result. We discuss the numerical value of the {ital T}=0 melting field for thin layers of a low-{ital T}{sub {ital c}} superconductor, such as {ital a}-MoGe, and single layers of high-{ital T}{sub {ital c}} materials. {copyright} {ital 1996 The American Physical Society.}

  8. Tungsten diffusion in silicon

    SciTech Connect

    De Luca, A.; Texier, M.; Burle, N.; Oison, V.; Pichaud, B.; Portavoce, A.; Grosjean, C.

    2014-01-07

    Two doses (10{sup 13} and 10{sup 15} cm{sup −2}) of tungsten (W) atoms were implanted in different Si(001) wafers in order to study W diffusion in Si. The samples were annealed or oxidized at temperatures between 776 and 960 °C. The diffusion profiles were measured by secondary ion mass spectrometry, and defect formation was studied by transmission electron microscopy and atom probe tomography. W is shown to reduce Si recrystallization after implantation and to exhibit, in the temperature range investigated, a solubility limit close to 0.15%–0.2%, which is higher than the solubility limit of usual metallic impurities in Si. W diffusion exhibits unusual linear diffusion profiles with a maximum concentration always located at the Si surface, slower kinetics than other metals in Si, and promotes vacancy accumulation close to the Si surface, with the formation of hollow cavities in the case of the higher W dose. In addition, Si self-interstitial injection during oxidation is shown to promote W-Si clustering. Taking into account these observations, a diffusion model based on the simultaneous diffusion of interstitial W atoms and W-Si atomic pairs is proposed since usual models used to model diffusion of metallic impurities and dopants in Si cannot reproduce experimental observations.

  9. Geometry-dependent phase, stress state and electrical properties in nickel-silicide nanowires

    NASA Astrophysics Data System (ADS)

    Wang, C. C.; Lai, W. T.; Hsiao, Y. Y.; Chen, I. H.; George, T.; Li, P. W.

    2016-05-01

    We report that the geometry of single-crystalline Si nanowires (NWs) prior to salicidation at 500 °C is the key factor controlling the phase, stress state, and electrical resistivity of the resulting Ni x Si y NWs of width less than 100 nm. This is a radical departure from previous observations of a single phase formation for nickel silicides generated from the silicidation of bulk Si substrates. The phase transition from NiSi for large NWs ( W Si NW  =  250-450 nm) to Ni2Si for small NWs ( W Si NW  =  70-100 nm) is well correlated with the observed volumetric expansion and electrical resistivity variation with the NW width. For the extremely small dimensions of Ni x Si y NWs, we propose that the preeminent, kinetics-based Zhang and d’Heurle model for salicidation be modified to a more thermodynamically-governed, volume-expansion dependent Ni x Si y phase formation. A novel, plastic deformation mechanism is proposed to explain the observed, geometry-dependent Ni x Si y NW phase formation that also strongly influences the electrical performance of the NWs.

  10. Applications of non-periodic multilayer optics for high-resolution x-ray microscopes below 30 keVa)

    NASA Astrophysics Data System (ADS)

    Troussel, Ph.; Dennetiere, D.; Rousseau, A.; Darbon, S.; Høghøj, P.; Hedacq, S.; Krumrey, M.

    2012-10-01

    Multilayer mirrors with enhanced bandwidth were developed with special performances for dense plasma diagnostics and mainly for high spatial resolution x-ray imaging. The multilayer coatings are designed to provide broadband x-ray reflectance at low grazing incidence angles. They are deposited onto toroidal mirror substrates. Our research is directed at the development of non-periodic (depth graded) W/Si multilayer specifically designed for use in the 1 to 30 keV photon energy band. First, we present a study for a 5 to 22 keV x-ray spectral window at 0.45° grazing angle. The goal is to obtain a high and constant reflectivity. Second, we have modeled a broadband mirror coating for harder x-rays in the range from 10 to 30 keV, with a non-periodic structure containing 300 W/SiC layers with periods in the range from 0.8 to 4 nm, designed for 0.35° grazing incidence angle.

  11. Emissivity enhancement coatings for thermophotovoltaic (TPV) radiator applications

    SciTech Connect

    Yue, J.J.; Cockeram, B.V.

    1998-12-01

    Ten emissivity enhancing coatings (ZrO{sub 2} + 18% TiO{sub 2} + 10% Y{sub 2}O{sub 3}, Cr{sub 2}O{sub 3}, ZrC, Fe{sub 2}TiO{sub 5}, ZrTiO{sub 4}, ZrO{sub 2} + 8% Y{sub 2}O{sub 3} + 2% HfO{sub 2}, TiC, TiC + 5% Al{sub 2}O{sub 3} + 5% TiO{sub 2}, ZrB{sub 2}, and ZrB{sub 2} + 10% MoSi{sub 2}) deposited on Mo, Nb, and Haynes 230 substrates were evaluated for potential use in thermophotovoltaic (TPV) radiator applications. Emissivity testing of as-coated and annealed coupons indicate that 5 of the 10 Vacuum Plasma Spray (VPS) coating candidates have promise (ZrO{sub 2} + 18% TiO{sub 2} + 10% Y{sub 2}O{sub 3}, ZrC, Fe{sub 2}TiO{sub 5}, ZrTiO{sub 4}, ZrO{sub 2} + 8% Y{sub 2}O{sub 3} + 2% HfO{sub 2}). Four of the ten coatings have emissivity values that are too low to be of further interest (TiC, TiC + 5% Al{sub 2}O{sub 3} + 5% TiO{sub 2}, ZrB{sub 2}, and ZrB{sub 2} + 10% MoSi{sub 2}). The final coating was mostly Cr{sub 2}O{sub 3}, and exhibited excessive evaporation during vacuum annealing with a significant decrease in emissivity. Base metal powder, which was added to the bond layer of all coatings to improve coating adhesion, was detected in the top layer of the coatings. Differences in reactive interaction between the base metal powder and coating during vacuum annealing produced varying changes in emissivity. A small decrease in emissivity was observed for the ZrC coating deposited on niobium, which agrees with the limited interaction between the niobium base metal particles and the ZrC coating detected in SEM/EDS examinations. A large decrease in emissivity was observed for the ZrC coating deposited on Haynes 230, and significant interaction between the base metal particles and ZrC coating was observed.

  12. Processing, Compatibility and Oxidation of Diboride - Oxide Matrix Composites for Ultrahigh-Temperature Applications.

    NASA Astrophysics Data System (ADS)

    Abada, Ahmed

    1990-01-01

    Promising results for the development of a ceramic/ceramic composite to be used for structural applications in the ultra high temperature range (1650-1850^ circC) have been obtained for alumina reinforced with titanium or zirconium diboribe coated with molybdenum disilicide. Prior to this achievement, several theoretical and experimental studies of particulate composites with (TiB_2 or ZrB_2) imbedded in (ZrO_2, Y_2 O_3 or Al_2 O_3) were conducted. Calculations of the compatibility and stability of oxide matrices with the diborides in vacuum showed positive energies of formation, indicating suitability of reinforcement of alumina under vacuum conditions. Also, since the sublimation of vapor species at ultra high temperatures is very critical to the stability of substances still existing in their condensed states, a detailed thermodynamic analysis of the metal -oxygen systems, was carried out using elemental data of the TiB_2, ZrB_2 , ZrO_2, Y_2 O_3, Al_2 O_3, MoSi_2 and their combinations (TiB_2 or ZrB_2)/(ZrO_2 , Y_2O_3 or Al_2O_3) for comparison, at 1650, 1850 and 2050^ circC. A comparison of the combination TiB _2 and ZrB_2 in MoSi_2/(Al_2O _3 or ZrO_2) at 1650^circC was also made. A stability analysis using equilibrium oxygen partial pressures for the TiB_2 and ZrB_2 decomposition at 1650, 1850 and 2050^ circC was carried out. A detailed characterization of the powders used for the oxide matrices, the diborides and the molybdenum disilicide are presented. The effects of the powder characteristics and the vacuum hot pressing parameters on the densification of the composites are discussed. Stability and chemical compatibility of the particulate and ternary composites in their as hot pressed states and following their vacuum and air oxidation treatments were characterized. Interdiffusion of elemental species across diboride/disilicide and oxide/disilicide interfaces was studies by EDS dot mapping. It is proposed that the growth of the Mo _5Si_3 is interface

  13. Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development

    NASA Astrophysics Data System (ADS)

    O'Sullivan, Gerry; Li, Bowen; D'Arcy, Rebekah; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; McCormack, Tom; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; Higashiguchi, Takeshi

    2015-07-01

    The primary requirement for the development of tools for extreme ultraviolet lithography (EUVL) has been the identification and optimization of suitable sources. These sources must be capable of producing hundreds of watts of extreme ultraviolet (EUV) radiation within a wavelength bandwidth of 2% centred on 13.5 nm, based on the availability of Mo/Si multilayer mirrors (MLMs) with a reflectivity of ˜70% at this wavelength. Since, with the exception of large scale facilities, such as free electron lasers, such radiation is only emitted from plasmas containing moderately to highly charged ions, the source development prompted a large volume of studies of laser produced and discharge plasmas in order to identify which ions were the strongest emitters at this wavelength and the plasma conditions under which their emission was optimized. It quickly emerged that transitions of the type 4p64dn - 4p54dn+1 + 4dn-14f in the spectra of Sn IX to SnXIV were the best candidates and work is still ongoing to establish the plasma conditions under which their emission at 13.5 nm is maximized. In addition, development of other sources at 6.X nm, where X ˜ 0.7, has been identified as the wavelength of choice for so-called Beyond EUVL (BEUVL), based on the availability of La/B based MLMs, with theoretical reflectance approaching 80% at this wavelength. Laser produced plasmas of Gd and Tb have been identified as potential source elements, as n = 4 - n = 4 transitions in their ions emit strongly near this wavelength. However to date, the highest conversion efficiency (CE) obtained, for laser to BEUV energy emitted within the 0.6% wavelength bandwidth of the available mirrors is only 0.8%, compared with values of 5% for the 2% bandwidth relevant for the Mo/Si mirrors at 13.5 nm. This suggests a need to identify other potential sources or the selection of other wavelengths for BEUVL. This review deals with the atomic physics of the highly-charged ions relevant to EUV emission at these

  14. Interlaced X-ray diffraction computed tomography

    PubMed Central

    Vamvakeros, Antonios; Jacques, Simon D. M.; Di Michiel, Marco; Senecal, Pierre; Middelkoop, Vesna; Cernik, Robert J.; Beale, Andrew M.

    2016-01-01

    An X-ray diffraction computed tomography data-collection strategy that allows, post experiment, a choice between temporal and spatial resolution is reported. This strategy enables time-resolved studies on comparatively short timescales, or alternatively allows for improved spatial resolution if the system under study, or components within it, appear to be unchanging. The application of the method for studying an Mn–Na–W/SiO2 fixed-bed reactor in situ is demonstrated. Additionally, the opportunities to improve the data-collection strategy further, enabling post-collection tuning between statistical, temporal and spatial resolutions, are discussed. In principle, the interlaced scanning approach can also be applied to other pencil-beam tomographic techniques, like X-ray fluorescence computed tomography, X-ray absorption fine structure computed tomography, pair distribution function computed tomography and tomographic scanning transmission X-ray microscopy. PMID:27047305

  15. Computational design for a wide-angle cermet-based solar selective absorber for high temperature applications

    NASA Astrophysics Data System (ADS)

    Sakurai, Atsushi; Tanikawa, Hiroya; Yamada, Makoto

    2014-01-01

    The purpose of this study is to computationally design a wide-angle cermet-based solar selective absorber for high temperature applications by using a characteristic matrix method and a genetic algorithm. The present study investigates a solar selective absorber with tungsten-silica (W-SiO2) cermet. Multilayer structures of 1, 2, 3, and 4 layers and a wide range of metal volume fractions are optimized. The predicted radiative properties show good solar performance, i.e., thermal emittances, especially beyond 2 μm, are quite low, in contrast, solar absorptance levels are successfully high with wide angular range, so that solar photons are effectively absorbed and infrared radiative heat loss can be decreased.

  16. Silicon Carbide (SiC) Power Processing Unit (PPU) for Hall Effect Thrusters

    NASA Technical Reports Server (NTRS)

    Reese, Bradley

    2015-01-01

    Arkansas Power Electronics International (APEI), Inc., is developing a high-efficiency, radiation-hardened 3.8-kW SiC power supply for the PPU of Hall effect thrusters. This project specifically targets the design of a PPU for the high-voltage Hall accelerator (HiVHAC) thruster, with target specifications of 80- to 160-V input, 200- to 700-V/5A output, efficiency greater than 96 percent, and peak power density in excess of 2.5 kW/kg. The PPU under development uses SiC junction field-effect transistor power switches, components that APEI, Inc., has irradiated under total ionizing dose conditions to greater than 3 MRad with little to no change in device performance.

  17. Influence of Basicity and MgO on Fluidity and Desulfurization Ability of High Aluminum Slag

    NASA Astrophysics Data System (ADS)

    Wang, Ping; Meng, Qing-min; Long, Hong-ming; Li, Jia-xin

    2016-08-01

    The viscosity of experimental slag, which was mixed based on the composition of a practical blast furnace slag, was measured in this paper. The influence of Al2O3 and MgO content, basicity R2 = w(CaO)/w(SiO2) on the fluidity of slag was studied. The stepwise regression analysis in SPSS was used to reveal the relationship between sulfur distribution coefficient LS and slag composition as well as furnace temperature. The results show that increasing of MgO up to 12% can decrease the slag viscosity. The w(MgO) should be controlled below 8% when there is 20% Al2O3 in the slag. Temperature of hot metal and content of CaO in slag are the two dominant factors on the desulfurization capacity of slag.

  18. High Temperature Performance of a SiC MESFET Based Oscillator

    NASA Technical Reports Server (NTRS)

    Schwartz, Zachary D.; Ponchak, George E.

    2005-01-01

    A hybrid, UHF-Band differential oscillator based on 10 w SiC RF Power Metal Semiconductor Field Effect Transistor (MESFET) has been designed, fabricated and characterized through 475 C. Circuit is fabricated on an alumina substrate with thin film spiral inductors, chip capacitors, chip resistors, and wire bonds for all crossovers and interconnectors. The oscillator delivers 15.7 dBm at 515 MHz into a 50 Ohm load at 125 C with a DC to RF conversion efficiency of 2,8%. After tuning the load impedance, the oscillator delivers 18.8 dBm at 610 MHz at 200 C with a DC to RF conversion efficiency of 5.8%. Finally, by tuning the load and bias conditions, the oscillator delivers 4.9 dBm at 453 MHz at 475 C.

  19. Investigation of Miniaturized Radioisotope Thermionic Power Generation for General Use

    NASA Technical Reports Server (NTRS)

    Duzik, Adam J.; Choi, Sang H.

    2016-01-01

    Radioisotope thermoelectric generators (RTGs) running off the radioisotope Pu238 are the current standard in deep space probe power supplies. While reliable, these generators are very inefficient, operating at only approx.7% efficiency. As an alternative, more efficient radioisotope thermionic emission generators (RTIGs) are being explored. Like RTGs, current RTIGs concepts use exotic materials for the emitter, limiting applicability to space and other niche applications. The high demand for long-lasting mobile power sources would be satisfied if RTIGs could be produced inexpensively. This work focuses on exposing several common materials, such as Al, stainless steel, W, Si, and Cu, to elevated temperatures under vacuum to determine the efficiency of each material as inexpensive replacements for thermoelectric materials.

  20. Optical constants for hard x-ray multilayers over the energy range E = 35 - 180 keV

    NASA Astrophysics Data System (ADS)

    Windt, David L.; Donguy, Soizik; Hailey, Charles J.; Koglin, Jason E.; Honkimaki, Veijo; Ziegler, Eric; Christensen, Finn E.; Harrison, Fiona A.

    2004-02-01

    We have determined experimentally optical constants for eight thin film materials that can be used in hard X-ray multilayer coatings. Thin film samples of Ni.97V.03, Mo, W, Pt, C, B4C, Si and SiC were deposited by magnetron sputtering onto superpolished optical flats. Optical constants were determined from fits to reflectance-vs-incidence angle measurements made using synchrotron radiation over the energy range E=35 180 keV. We have also measured the X-ray reflectance of a prototype W/SiC multilayer coating over the energy range E=35 100 keV, and we compare the measured reflectance with a calculation using the newly derived optical constants.

  1. Production and performance of multilayer-coated conical x-ray mirrors

    NASA Astrophysics Data System (ADS)

    Ulmer, Melville P.; Altkorn, Robert; Graham, Michael E.; Madan, Anita; Chu, Yong S.

    2003-12-01

    A method of fabricating replica figured x-ray optics with integral multilayer coatings is presented. With the intact electroforming multilayer process (IEMP) technique, we sputter multilayers onto a reusable superpolished mandrel, electroform nickel over the multilayers, and remove the multilayer-coated nickel shell intact from the mandrel. This approach offers advantages over more traditional, original, and segmented-replica fabrication techniques, including low cost; compatibility with a wide range of mirror designs, diameters, and focal lengths; simple integration with multilayer sputtering processes; and the ability to produce complete shells of revolution. The fabrication of W/Si multilayer-coated 10-cm-diameter conical x-ray mirrors is described, as are reflectivity measurements at 10 and 30 keV. The measured reflectivity of the IEMP multilayers at the 10-keV primary Bragg peak was 17%. Measurements of multiple points on the cone showed multilayer uniformity to within a few percent around the mirror.

  2. Investigation of miniaturized radioisotope thermionic power generation for general use

    NASA Astrophysics Data System (ADS)

    Duzik, Adam J.; Choi, Sang H.

    2016-04-01

    Radioisotope thermoelectric generators (RTGs) running off the radioisotope Pu238 are the current standard in deep space probe power supplies. While reliable, these generators are very inefficient, operating at only ~7% efficiency. As an alternative, more efficient radioisotope thermionic emission generators (RTIGs) are being explored. Like RTGs, current RTIGs concepts use exotic materials for the emitter, limiting applicability to space and other niche applications. The high demand for long-lasting mobile power sources would be satisfied if RTIGs could be produced inexpensively. This work focuses on exposing several common materials, such as Al, stainless steel, W, Si, and Cu, to elevated temperatures under vacuum to determine the efficiency of each material as inexpensive replacements for thermoelectric materials.

  3. Nose-cone calorimeter: PHENIX forward upgrade

    NASA Astrophysics Data System (ADS)

    Chvala, Ondrej

    2009-07-01

    PHENIX is a high rate experiment efficient at measuring rare processes, but has limited acceptance in azimuth and pseudorapidity ( η). The Nose Cone Calorimeter (NCC), a W-Si sampling calorimeter in the region of 0.9< η<3, is one of the upgrades which will significantly increase coverage in both azimuth and pseudorapidity. The NCC will expand PHENIX’s precision measurements of electromagnetic probes in η, reconstruct jets, perform a wide scope of correlation measurements, and enhance triggering capabilities. The detector will significantly contribute to measurements of γ-jet correlations, quarkonia production, and low- x nuclear structure functions. This report discusses details of the detector design and its performance concerning a sample of the physics topics which will benefit from the NCC. In view of recent funding difficulties, outlook of the activities is discussed.

  4. Tests of variable-band multilayers designed for investigating optimal signal-to-noise vs artifact signal ratios in Dual-Energy Digital Subtraction Angiography (DDSA) imaging systems

    SciTech Connect

    Boyers, D.; Ho, A.; Li, Q.; Piestrup, M.; Rice, M.; Tatchyn, R.

    1993-08-01

    In recent work, various design techniques were applied to investigate the feasibility of controlling the bandwidth and bandshape profiles of tungsten/boron-carbon (W/B{sub 4}C) and tungsten/silicon (W/Si) multilayers for optimizing their performance in synchrotron radiation based angiographical imaging systems at 33 keV. Varied parameters included alternative spacing geometries, material thickness ratios, and numbers of layer pairs. Planar optics with nominal design reflectivities of 30%--94% and bandwidths ranging from 0.6%--10% were designed at the Stanford Radiation Laboratory, fabricated by the Ovonic Synthetic Materials Company, and characterized on Beam Line 4-3 at the Stanford Synchrotron Radiation Laboratory, in this paper we report selected results of these tests and review the possible use of the multilayers for determining optimal signal to noise vs. artifact signal ratios in practical Dual-Energy Digital Subtraction Angiography systems.

  5. Sub-5 nm hard x-ray point focusing by a combined Kirkpatrick-Baez mirror and multilayer zone plate.

    PubMed

    Döring, F; Robisch, A L; Eberl, C; Osterhoff, M; Ruhlandt, A; Liese, T; Schlenkrich, F; Hoffmann, S; Bartels, M; Salditt, T; Krebs, H U

    2013-08-12

    Compound optics such as lens systems can overcome the limitations concerning resolution, efficiency, or aberrations which fabrication constraints would impose on any single optical element. In this work we demonstrate unprecedented sub-5 nm point focusing of hard x-rays, based on the combination of a high gain Kirkpatrick-Baez (KB) mirror system and a high resolution W/Si multilayer zone plate (MZP) for ultra-short focal length f. The pre-focusing allows limiting the MZP radius to below 2 μm, compatible with the required 5 nm structure width and essentially unlimited aspect ratios, provided by enabling fabrication technology based on pulsed laser deposition (PLD) and focused ion beam (FIB).

  6. Effects of gravity on combustion synthesis of functionally graded biomaterials

    NASA Astrophysics Data System (ADS)

    Moore, J.; Schowengerdt, F.; Ayers, R.; Castillo, M.; Zhang, X.; Umakoshi, U.; Yi, C.; Guigne, J.

    Combustion synthesis, or self-propagating, high temperature synthesis (SHS) is currently being used at the Colorado School of Mines to produce advanced materials for biomedical applications. These biomaterials include ceramic, intermetallic, and metal-matrix composites for applications ranging from structural to oxidation- and wear-resistant materials, e.g., TiC-Ti, TiC-Cr3 C2 , MoSi2 - SiC, NiAl-TiB2 , to engineered porous composites, e.g., B4 C-A l2 O3 , Ti-TiBx , Ni-Ti, Ca 3 (PO4 )2 and glass- ceramic composites, e.g., CaO-SiO2 - B a O-A l2 O3 -T i B2 . The goal of the functionally graded biomaterials project is to develop new materials, graded in porosity and composition, which will combine the desirable mechanical properties of implant, e.g., NiTi, with the bone-growth enhancement properties of porous biodegradable ceramics, e.g., Ca 3 (PO4 )2 . Recent experiments on the NASA parabolic flight (KC- 135) aircraft have shown that gravity plays an important role in controlling the structure and properties of materials produced by combustion synthesis. The results of these studies, which will be presented at the conference, will provide valuable input to the design of experiments to be done in Space-DRUMSTM, a containerless materials processing facility scheduled to be placed on the International Space Station in 2003.

  7. SiC (SCS-6) Fiber Reinforced-Reaction Formed SiC Matrix Composites: Microstructure and Interfacial Properties

    NASA Technical Reports Server (NTRS)

    Singh, M.; Dickerson, R. M.; Olmstead, Forrest A.; Eldridge, J. I.

    1997-01-01

    Microstructural and interfacial characterization of unidirectional SiC (SCS-6) fiber reinforced-reaction formed SiC (RFSC) composites has been carried out. Silicon-1.7 at.% molybdenum alloy was used as the melt infiltrant, instead of pure silicon, to reduce the activity of silicon in the melt as well as to reduce the amount of free silicon in the matrix. Electron microprobe analysis was used to evaluate the microstructure and phase distribution in these composites. The matrix is SiC with a bi-modal grain-size distribution and small amounts of MoSi2, silicon, and carbon. Fiber push-outs tests on these composites showed that a desirably low interfacial shear strength was achieved. The average debond shear stress at room temperature varied with specimen thickness from 29 to 64 MPa, with higher values observed for thinner specimens. Initial frictional sliding stresses showed little thickness dependence with values generally close to 30 MPa. Push-out test results showed very little change when the test temperature was increased to 800 C from room temperature, indicating an absence of significant residual stresses in the composite.

  8. A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography

    NASA Astrophysics Data System (ADS)

    Ling, Moh Lung; Chua, Gek Soon; Tay, Cho Jui; Quan, Chenggen; Lin, Qunying

    2007-03-01

    193nm immersion lithography has successfully enabled numerical aperture (NA) greater than 1.0 which allows rooms for improvement in resolution as well as depth of focus. In this study, critical dimension (CD) and depth of focus (DOF) performance for the 45nm technology node for dry and immersion lithography is compared using commercial available simulation tool. The study is based on one dimensional line and space pattern with pitch vary from 150 to 500nm. The effects of mask transmission and phase angle change on CD through pitch performance and DOF are also presented in this paper. Increase in mask transmission will result in increase of CD through pitch and reduction of DOF. When phase angle for the phase shift mask is less than 180 degree, CD through pitch and DOF drop. Finally, mask defects caused by haze on several locations which include MoSi lines, line edges, and space between line ends are simulated. The influence of these defects on CD and the potential line end bridging problem is presented.

  9. Adsorption and electron-induced polymerization of methyl methacrylate on Ru(1010).

    PubMed

    Hedhili, M N; Yakshinskiy, B V; Wasielewski, R; Ciszewski, A; Madey, T E

    2008-05-01

    The adsorption and electron irradiation of methyl methacrylate (MMA) on a Ru(1010) surface have been studied using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and low energy ion scattering. TPD analysis indicates that a monolayer of MMA chemisorbs and dissociates on the Ru(1010) surface. The reaction products observed upon heating include H(2), CO, CO(2), and a small amount of MMA. Physisorbed multilayers of MMA desorb at temperatures around 170 K. Electron irradiation of physisorbed MMA at 140 K leads to a modification of the MMA film: The XPS spectra show an increase in thermal stability of the film with retention of the MMA structure, and indicate that electron irradiation induces polymerization. An increase in the electron bombardment fluence induces a degradation of the formed polymerized species and leads to the accumulation of carbon on the Ru surface. These results are relevant to the accumulation of carbon on surfaces of Ru films that serve as capping layers on MoSi multilayer mirrors used in extreme ultraviolet lithography.

  10. Crystallographic study of Si and ZrN coated U-Mo atomised particles and of their interaction with al under thermal annealing

    NASA Astrophysics Data System (ADS)

    Zweifel, T.; Palancher, H.; Leenaers, A.; Bonnin, A.; Honkimaki, V.; Tucoulou, R.; Van Den Berghe, S.; Jungwirth, R.; Charollais, F.; Petry, W.

    2013-11-01

    A new type of high density fuel is needed for the conversion of research and test reactors from high to lower enriched uranium. The most promising one is a dispersion of atomized uranium-molybdenum (U-Mo) particles in an Al matrix. However, during in-pile irradiation the growth of an interaction layer between the U-Mo and the Al matrix strongly limits the fuel's performance. To improve the in-pile behaviour, the U-Mo particles can be coated with protective layers. The SELENIUM (Surface Engineering of Low ENrIched Uranium-Molybdenum) fuel development project consists of the production, irradiation and post-irradiation examination of 2 flat, full-size dispersion fuel plates containing respectively Si and ZrN coated U-Mo atomized powder dispersed in a pure Al matrix. In this paper X-ray diffraction analyses of the Si and ZrN layers after deposition, fuel plate manufacturing and thermal annealing are reported. It was found for the U-Mo particles coated with ZrN (thickness 1 μm), that the layer is crystalline, and exhibits lower density than the theoretical one. Fuel plate manufacturing does not strongly influence these crystallographic features. For the U-Mo particles coated with Si (thickness 0.6 μm), the measurements of the as received material suggest an amorphous state of the deposited layer. Fuel plate manufacturing strongly modifies its composition: Si reacts with the U-Mo particles and the Al matrix to grow U(Al, Si)3 and U3Si5 phases. Finally both coatings have shown excellent performances under thermal treatment by limiting drastically the U-Mo/Al interdiffusion. U(Al,Si)3 with two lattice parameters (4.16 Å and 4.21 Å), A distorted U3Si5 phase. Note that these phases were not present in the U-Mo(Si) powders. These phases are usually found in the Silicon rich diffusion layer (SiRDL) obtained in dispersed fuels (as-manufactured U-Mo/Al(Si) fuel plates [12,3] or annealed UMo(Si)/Al fuel rods [40]) as well as in diffusion couples (U-Mo/Al(Si7) [37-39] or U-Mo/Si

  11. Dry etching technologies for the advanced binary film

    NASA Astrophysics Data System (ADS)

    Iino, Yoshinori; Karyu, Makoto; Ita, Hirotsugu; Yoshimori, Tomoaki; Azumano, Hidehito; Muto, Makoto; Nonaka, Mikio

    2011-11-01

    ABF (Advanced Binary Film) developed by Hoya as a photomask for 32 (nm) and larger specifications provides excellent resistance to both mask cleaning and 193 (nm) excimer laser and thereby helps extend the lifetime of the mask itself compared to conventional photomasks and consequently reduces the semiconductor manufacturing cost [1,2,3]. Because ABF uses Ta-based films, which are different from Cr film or MoSi films commonly used for photomask, a new process is required for its etching technology. A patterning technology for ABF was established to perform the dry etching process for Ta-based films by using the knowledge gained from absorption layer etching for EUV mask that required the same Ta-film etching process [4]. Using the mask etching system ARES, which is manufactured by Shibaura Mechatronics, and its optimized etching process, a favorable CD (Critical Dimension) uniformity, a CD linearity and other etching characteristics were obtained in ABF patterning. Those results are reported here.

  12. High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition

    NASA Astrophysics Data System (ADS)

    Becker, Hans W.; Sobel, Frank; Aschke, Lutz; Renno, Markus; Krieger, Juergen; Buttgereit, Ute; Hess, Guenter; Lenzen, Frank; Knapp, Konrad; Yulin, Sergey A.; Feigl, Torsten; Kuhlmann, Thomas; Kaiser, Norbert

    2002-12-01

    EUV mask blanks consist of two thin film systems deposited on low thermal expansion 6 inch substrates (LTEM). First there is the multilayer stack with around 100 alternating layers of elements with different optical properties which are topped by a capping layer. The absorber stack which consists of a buffer and a absorber layer is next. Here a minimum absorption of EUV light of 99 % is required. The stress in both layer systems should be as low as possible. The reduction of defects to an absolute minimum is one of the main challenges. The high-reflective Mo/Si multilayer coatings were designed for normal incidence reflectivity and successfully deposited on 6-inch LTEM substrates by ion-beam sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer interfaces and the surface morphology. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation at the "Physikalisch- Technischen Bundesanstalt" (PTB) refelctometer at BESSY II, Berlin, Germany. A high resolution laser scanner was used to measure the particle distribution. First multilayer defect results are presented.

  13. Performance of "Waterless Concrete"

    NASA Technical Reports Server (NTRS)

    Toutanji, H. A.; Grugel, R. N.

    2009-01-01

    Waterless concrete consists of molten elementary sulfur and aggregate. The aggregates in a lunar environment will be lunar rocks and soil. Sulfur is present on the Moon in Troilite soil (FeS) and, by oxidation of the soil, iron and sulfur can be produced. Sulfur concrete specimens were cycled between liquid nitrogen (approx.]91 C) and room temperature (^21 C) to simulate exposure to a lunar environment. Cycled and control specimens were subsequently tested in compression at room temperatures (^21 C) and ^-101 C. Test results showed that due to temperature cycling, the compressive strength of cycled specimens was 20% of those non-cycled. This reduction in strength can be attributed to the large differences in thermal coefficients of expansion of the materials constituting the concrete which promoted cracking. Similar sulfur concrete mixtures were strengthened with short and long glass fibres. The lunar regolith simulant was melted in a 25 cc Pt- Rh crucible in a Sybron Thermoline high temperature MoSi2 furnace at melting temperatures of 1450 to 1600 C for times of 30 min to i hour. Glass fibres and small rods were pulled from the melt. The glass fibres were used to reinforce sulfur concrete plated to improve the flexural strength of the sulfur concrete. Beams strengthened with glass fibres showed to exhibit an increase in the flexural strength by as much as 45%.

  14. In situ observation of thermal expansion of tetragonal C11b phase in Zr2Cu(1-x)Odx alloys

    SciTech Connect

    Xu, Min; Ye, Y. Y.; Morris, James R; Sordelet, D. J.; Kramer, M. J.

    2010-01-01

    The C11b phase crystalline structure (structure type MoSi{sub 2}, space group I4/mmm) in the Zr{sub 2}Cu{sub (1-x)}Pd{sub x} (x = 0, 0.25, 0.5, 0.75 and 1) alloys was examined in situ using high temperature X-ray diffraction (HTXRD) and Rietveld refinement of the data obtained at a constant heating rate. While the cell volume increases with increasing Pd as expected by the larger atomic radii, the coefficients of thermal expansion (CTEs) do not follow a uniform trend. The bonding in the basal plane is more elastically rigid than along the c-axis for all compositions. The CTE is more anisotropic for Zr{sub 2}Pd than for Zr{sub 2}Cu, which is consistent with the first-principles calculations that illustrate the rigidity of c-axis relatively to a-axis to be the less for Zr{sub 2}Pd. The CTE of the a-axis for Zr{sub 2}Pd is in fact negative over the temperature range measured.

  15. Mask degradation monitoring with aerial mask inspector

    NASA Astrophysics Data System (ADS)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  16. Recent developments on corrosion-resistant diffusion coatings

    SciTech Connect

    Kung, S.C.; Rapp, R.A.

    1999-07-01

    The halide-activated pack cementation process has been used to grow corrosion-resistant diffusion coatings for a variety of traditional and advanced materials. Further understanding of the thermodynamics for packs activated by a selected pair of halide salts has led to the codeposition of two elements to form adherent coatings with compositions resistant to cyclic oxidation and other corrosion attack. The coating method has been applied in various novel ways to protect advanced materials. For example, different schemes are presented to create effective coatings for the application of materials for hot-gas cleanup and heat-exchanger tubes in combined-cycle coal-fired power generating systems. Likewise, developmental refractory-metal aluminides have been protected by either aluminizing or siliciding. The protection of Mo by a pack-grown Mo(Si,Ge){sub 2} coating may eliminate the occurrence of pesting in low-temperature oxidation. Traditional steels for boiler applications can be protected by the codeposition of Cr and Si to grow a ferrite surface layer with an approximate composition of Fe-25Cr-3Si. Alternatively, the codeposition of Al and Cr can yield a very corrosion-resistant composition of Fe{sub 3}(Al,Cr).

  17. DIET Processes on Ruthenium Surfaces Related to Extreme Ultraviolet Lithography (EUVL)

    SciTech Connect

    Yakshinskiy, B.; Wasielewski, R; Loginova, E; Hedhili, M; Madey, T

    2008-01-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions (high vacuum, and 13.5 nm (92 eV) photons). Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H{sub 2}O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is 6 x 10{sup -19} cm{sup 2}. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is 0.02 electrons/photon at 92 eV.

  18. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.

    PubMed

    Lee, Soo Jin; Jung, Chang Yong; Park, Sung Jin; Hwangbo, Chang Kweun; Seo, Hwan Seok; Kim, Sung Soo; Lee, Nae-Eung

    2012-04-01

    Among the core EUVL (extreme ultra-violet lithography) technologies for nanoscale patterning below the 30 nm node for Si chip manufacturing, new materials and fabrication processes for high-performance EUVL masks are of considerable importance due to the use of new reflective optics. In this work, the selective etching of SnO2 (tin oxide) as a new absorber material, with high EUV absorbance due to its large extinction coefficient, for the binary mask structure of SnO2 (absorber layer)/Ru (capping/etch stop layer)/Mo-Si multilayer (reflective layer)/Si (substrate), was investigated. Because infinitely high selectivity of the SnO2 layer to the Ru ESL is required due to the ultrathin nature of the Ru layer, various etch parameters were assessed in the inductively coupled Cl2/Ar plasmas in order to find the process window required for infinitely high etch selectivity of the SnO2 layer. The results showed that the gas flow ratio and V(dc) value play an important role in determining the process window for the infinitely high etch selectivity of SnO2 to Ru ESL. The high EUV-absorbance SnO2 layer, patternable by a dry process, allows a smaller absorber thickness, which can mitigate the geometric shadowing effects observed for high-performance binary EUVL masks.

  19. Understanding Particle Defect Transport in an Ultra-Clean Sputter Coating Process

    SciTech Connect

    Walton, C; Kearney, P; Folta, J; Sweeney, D; Mirkarimi, P

    2003-03-24

    Low-defect mask blanks remain a key technical challenge to Extreme Ultraviolet Lithography (EUVL). The mask blank is ion-beam sputter-coated with an 81-layer Mo/Si multilayer stack for high reflectance at {lambda} = 13.4nm. The current mask coating process can achieve a median added defect level of 0.05 defects/cm{sup 2} (12 added defects 90nm or larger on a 200mm Si-wafer test substrate), but this must be reduced by about a factor of 10 to meet mask cost requirements for EUVL. To further reduce the particle defect level, we have studied pathways for particle transport, using test particles and particles native to the coating process, and combined the results into a computational model of particle transport in an ion-beam sputter system. At process pressure, gas drag is negligible for particles above 100nm, so particles travel ballistically until they hit a surface. Bounce from chamber walls allows particles to reach all surfaces in the chamber if they have initial velocities above {approx}100m/s. The ion beam has sufficient momentum to entrain slower particles and accelerate them toward the sputter target, where some can bounce to the substrate. The model shows preliminary agreement with experimental defect distributions on witness wafers at various positions within the coating chamber.

  20. New Fiber Reinforced Waterless Concrete for Extraterrestrial Structural Applications

    NASA Technical Reports Server (NTRS)

    Toutanji, H.; Tucker, D.; Ethridge, E.

    2005-01-01

    Commercial use of sulfur concrete on Earth is well established, particularly in corrosive, e.g., acid and salt, environments. Having found troilite (FeS) on the Moon raises the question of using extracted sulfur as a lunar construction mate: iii an attractive alternative to conventional concrete as it does not require water For the purpose of this paper it is assumed that lunar ore is mined, refined, and the raw sulfur processed with appropriate lunar regolith to form, for example, brick and beam elements. Glass fibers produced from regolith were used as a reinforcement to improve the mechanical properties of the sulfur concrete. Glass fibers and glass rebar were produced by melting the lunar regolith simulant. Lunar regolith stimulant was melted in a 25 cc Pt-Rh crucible in a Sybron Thermoline 46100 high temperature MoSi2 furnace at melting temperatures of 1450 to 1600G. The glass melt wets the ceramic rod and long continuous glass fibers were easily hand drawn. The glass fibers were immediately coated with a protective polymer to maintain the mechanical strength. The viability of sulfur concrete as a construction material for extraterrestrial application is presented. The mechanical properties of the glass fiber reinforced sulfur concrete were investigated.

  1. Elevated Temperature Deformation of Cr3Si Alloyed with Mo

    NASA Technical Reports Server (NTRS)

    Raj, S. V.; Whittenberger, J. Daniel; Zeumer, B.; Sauthoff, G.

    1998-01-01

    Four-point bend, constant load compressive creep and constant engineering strain rate tests were conducted on arc-melted and powder-metallurgy (PM) processed Cr40Mo30Si30 specimens in the temperature range 1400 and 1700 K. This is a two phase alloy consisting of (CrMo)3Si and (Cr,Mo)5Si3 phases. The PM specimens, which were substantially weaker than the arc-melted materials, exhibited a stress exponent n, of about 2 and an apparent activation energy for creep, Q(sub 3), of 485 kJ/mol. The mechanism in these specimens appeared to be controlled by creep of a glassy phase. In the case of arc-melted specimens for which nis approximately 3 and Q(sub 3) is approximately 430 kJ/mol, the rate-controlling creep mechanism appeared to be that dominant in the (Cr,Mo)5Si3 phase. In this case, it is suggested that the Nabarro creep mechanism, where dislocation climb is controlled by Bardeen-Herring vacancy sources, is the dominant creep mechanism. Finally, an analysis of the present and literature data on Cr3Si alloyed with Mo appeared to suggest that the creep rate decreases sharply with an increase in the Mo/Si ratio.

  2. Evaluation of nickel and molybdenum silicides for dual gate complementary metal-oxide semiconductor application

    NASA Astrophysics Data System (ADS)

    Biswas, Nivedita; Gurganus, Jason; Misra, Veena; Yang, Yan; Stemmer, Susanne

    2005-01-01

    Characteristics of NiSi and MoSi via full consumption of undoped silicon layers have been studied. Interaction of nickel (Ni) and molybdenum (Mo) silicides with SiO2 was evaluated in terms of work function and thermal stability. For nickel silicide, the work function values were low for samples annealed at 400 °C even after full consumption of silicon. The work function increased with the anneal temperature and stabilized at 600 °C to close to midgap values. Dielectric interaction as a result of silicide formation was studied using current-voltage characteristics. Low leakage currents in these stacks indicated minimum dielectric damage due to silicided gates. Silicidation of Mo was found to be incomplete as the capacitance-voltage curves were marked with larger EOT values and negative shifts in the flatband voltages even at 700 °C. Auger depth profiling, high resolution transmission electron microscopy (HRTEM) and x-ray diffraction (XRD) were used for material analysis of the silicided gate stacks.

  3. Boron modified molybdenum silicide and products

    DOEpatents

    Meyer, M.K.; Akinc, M.

    1999-02-02

    A boron-modified molybdenum silicide material is disclosed having the composition comprising about 80 to about 90 weight % Mo, about 10 to about 20 weight % Si, and about 0.1 to about 2 weight % B and a multiphase microstructure including Mo{sub 5}Si{sub 3} phase as at least one microstructural component effective to impart good high temperature creep resistance. The boron-modified molybdenum silicide material is fabricated into such products as electrical components, such as resistors and interconnects, that exhibit oxidation resistance to withstand high temperatures in service in air as a result of electrical power dissipation, electrical resistance heating elements that can withstand high temperatures in service in air and other oxygen-bearing atmospheres and can span greater distances than MoSi{sub 2} heating elements due to improved creep resistance, and high temperature structural members and other fabricated components that can withstand high temperatures in service in air or other oxygen-bearing atmospheres while retaining creep resistance associated with Mo{sub 5}Si{sub 3} for structural integrity. 7 figs.

  4. Boron modified molybdenum silicide and products

    DOEpatents

    Meyer, Mitchell K.; Akinc, Mufit

    1999-02-02

    A boron-modified molybdenum silicide material having the composition comprising about 80 to about 90 weight % Mo, about 10 to about 20 weight % Si, and about 0.1 to about 2 weight % B and a multiphase microstructure including Mo.sub.5 Si.sub.3 phase as at least one microstructural component effective to impart good high temperature creep resistance. The boron-modified molybdenum silicide material is fabricated into such products as electrical components, such as resistors and interconnects, that exhibit oxidation resistance to withstand high temperatures in service in air as a result of electrical power dissipation, electrical resistance heating elements that can withstand high temperatures in service in air and other oxygen-bearing atmospheres and can span greater distances than MoSi.sub.2 heating elements due to improved creep resistance, and high temperature structural members and other fabricated components that can withstand high temperatures in service in air or other oxygen-bearing atmospheres while retaining creep resistance associated with Mo.sub.5 Si.sub.3 for structural integrity.

  5. Fracture and fatigue properties of Mo-Mo{sub 3}Si-Mo{sub 5}SiB{sub 2} refractory intermetallic alloys at ambient to elevated temperatures (25-1300 degrees Centigrade)

    SciTech Connect

    Choe, Heeman; Schneibel, J.H.; Ritchie, R.O.

    2002-08-01

    The need for structural materials with high-temperature strength and oxidation resistance coupled with adequate lower-temperature toughness for potential use at temperatures above {approx} 1000 degrees C has remained a persistent challenge in materials science. In this work, one promising class of intermetallic alloys is examined, namely boron-containing molybdenum silicides, with compositions in the range Mo (bal), 12-17 at. percentSi, 8.5 at. percentB, processed using both ingot (I/M) and powder (P/M) metallurgy methods. Specifically, the oxidation (''pesting''), fracture toughness and fatigue-crack propagation resistance of four such alloys, which consisted of {approx}21 to 38 vol. percent a-Mo phase in an intermetallic matrix of Mo3Si and Mo5SiB2 (T2), were characterized at temperatures between 25 degrees and 1300 degrees C. The boron additions were found to confer superior ''pest'' resistance (at 400 degrees to 900 degrees C) as compared to unmodified molybdenum silicides, such as Mo5Si3. Moreover , although the fracture and fatigue properties of the finer-scale P/M alloys were only marginally better than those of MoSi2, for the I/M processed microstructures with coarse distributions of the a-Mo phase, fracture toughness properties were far superior, rising from values above 7 MPa sqrt m at ambient temperatures to almost 12 MPa sqrt m at 1300 degrees C.

  6. EUVL printing results of a low-thermal expansion material (LTEM) mask

    NASA Astrophysics Data System (ADS)

    Tong, William M.; Taylor, John S.; Hector, Scott D.; Shell, Melissa K.; Zhang, Guojing; Kearney, Patrick A.; Walton, Christopher C.; Larson, Cindy C.; Wasson, James R.; Mangat, Pawitter J. S.; O'Connell, Donna J.; Folk, Daniel R.

    2000-07-01

    Minimizing image placement errors due to thermal distortion of the mask is a key requirement for qualifying EUV Lithography as a Next Generation Lithography (NGL). Employing Low Thermal Expansion Materials (LTEMs) for mask substrates is a viable solution for controlling mask thermal distortion and is being investigated by a wide array of researchers, tool makers, photomask suppliers, and material manufacturers. Finite element modeling has shown that an EUVL mask with a Coefficient of Thermal Expansion (CTE) of less than 20 ppb/K will meet overlay error budgets for Mo/Si multilayers, patterned, and printed using the 10X Microstepper. The images were essentially indistinguishable from those images acquired from masks fabricated from high quality silicon wafers as substrates. Our observations lend further evidence that an LTEM can be used as the EUVL mask substrate material.

  7. EUV imaging experiment of an adaptive optics telescope

    NASA Astrophysics Data System (ADS)

    Kitamoto, S.; Shibata, T.; Takenaka, E.; Yoshida, M.; Murakami, H.; Shishido, Y.; Gotoh, N.; Nagasaki, K.; Takei, D.; Morii, M.

    2009-08-01

    We report an experimental result of our normal-incident EUV telescope tuned to a 13.5 nm band, with an adaptive optics. The optics consists of a spherical primary mirror and a secondary mirror. Both are coated by Mo/Si multilayer. The diameter of the primary and the secondary mirrors are 80 mm and 55mm, respectively. The secondary mirror is a deformable mirror with 31 bimorph-piezo electrodes. The EUV from a laser plasma source was exposed to a Ni mesh with 31 micro-m wires. The image of this mesh was obtained by a backilluminated CCD. The reference wave was made by an optical laser source with 1 μm pin-hole. We measure the wave form of this reference wave and control the secondary mirror to get a good EUV image. Since the paths of EUV and the optical light for the reference were different from each other, we modify the target wave from to control the deformable mirror, as the EUV image is best. The higher order Zernike components of the target wave form, as well as the tilts and focus components, were added to the reference wave form made by simply calculated. We confirmed the validity of this control and performed a 2.1 arc-sec resolution.

  8. Atom probe tomography investigation of lath boundary segregation and precipitation in a maraging stainless steel.

    PubMed

    Thuvander, Mattias; Andersson, Marcus; Stiller, Krystyna

    2013-09-01

    Lath boundaries in a maraging stainless steel of composition 13Cr-8Ni-2Mo-2Cu-1Ti-0.7Al-0.3Mn-0.2Si-0.03C (at%) have been investigated using atom probe tomography following aging at 475 °C for up to 100 h. Segregation of Mo, Si and P to the lath boundaries was observed already after 5 min of aging, and the amount of segregation increases with aging time. At lath boundaries also precipitation of η-Ni₃(Ti, Al) and Cu-rich 9R, in contact with each other, takes place. These co-precipitates grow with time and because of coarsening the area number density decreases. After 100 h of aging a ∼5 nm thick film-like precipitation of a Mo-rich phase was observed at the lath boundaries. From the composition of the film it is suggested that the phase in question is the quasicrystalline R' phase. The film is perforated with Cu-rich 9R and η-Ni₃(Ti, Al) co-precipitates. Not all precipitate types present in the matrix do precipitate at the lath boundaries; the Si-containing G phase and γ'-Ni₃(Ti, Al, Si) and the Cr-rich α' phase were not observed at the lath boundaries.

  9. X-ray optics for laser-plasma sources: Aplications of intense SXR and EUV radiation pulses

    SciTech Connect

    Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Anna; Szczurek, Miroslaw; Wachulak, Przemyslaw; Pina, Ladislav

    2012-05-17

    In this work we present a short review of SXR and EUV optics that have been designed and developed for experiments concerning material processing and imaging, using a laser-plasma radiation source based on a gas puff target. Three different kinds of mirrors employed as the EUV collectors are presented: the grazing incidence axisymmetrical ellipsoidal mirror, the grazing incidence multifoil mirror, and the ellipsoidal mirror with Mo/Si multilayer coating. Experiments concerning characterization of the mirrors were performed using EUV radiation from Kr or Xe plasmas produced in a double stream gas puff target irradiated with Nd:YAG laser pulses (4ns, 0.8 J, 10 Hz). Intensity of the focused radiation was sufficient for micromachining of organic polymers and surface modification of organic and inorganic solids. Different kinds of micro-and nanostructures created in near-surface layers of different kinds polymers were obtained. Significant differences were revealed in XPS spectra acquired for irradiated and not irradiated polymers.

  10. Role of matrix/reinforcement interfaces in the fracture toughness of brittle materials toughened by ductile reinforcements

    NASA Astrophysics Data System (ADS)

    Xiao, L.; Abbaschian, R.

    1992-10-01

    Crack interactions with ductile reinforcements, especially behavior of a crack tip at the interface, have been studied using MoSi2 composites reinforced with Nb foils. Effects of fracture energy of interfaces on toughness of the composites have also been investigated. Variation of interfacial bonding was achieved by depositing an oxide coating or by the development of a reaction prod- uct layer between the reinforcement and matrix. Toughness was measured using bend tests on chevron-notched specimens. It has been established that as a crack interacts with a ductile re- inforcement, three mechanisms compcte: interfacial debonding, multiple matrix fracture, and direct crack propagation through the reinforcement. Decohesion length at the matrix/reinforcement interface depends on the predominant mechanism. Furthermore, the results add to the evidence that the extent to which interfacial bonding is conducive to toughness of the composites depends on the criterion used to describe the toughness and that ductility of the ductile reinforcement is also an important factor in controlling toughness of the composites. Loss of ductility of the ductile reinforcement due to inappropriate processing could result in little improvement in tough- ness of the composites.

  11. High-temperature corrosion of UNS N10003 in molten Li2BeF4 (FLiBe) salt

    DOE PAGES

    Zheng, Guiqiu; Kelleher, Brian; He, Lingfeng; Cao, Guoping; Anderson, Mark; Allen, Todd; Sridharan, Kumar

    2015-07-30

    Here, corrosion testing of Hastelloy N in molten fluoride salt was performed in purified molten 27LiF-BeF2 (66-34mol%) (FLiBe) salt at 700°C for 1000 hours, in pure nickel and graphite capsules. In the nickel capsule tests, the near-surface region of the alloy exhibited an about 200 nm porous structure, an approximately 3.5 μm chromium depleted region, and MoSi2 precipitates. In tests performed in graphite capsules, the alloy samples gained weight due to the formation of a variety of Cr3C2, Cr7C3, Mo2C and Cr23C6, carbide phases on the surface and in the subsurface regions of the alloy. A Cr depleted region wasmore » observed in the near-surface region where Mo thermally diffused toward either surface or grain boundary, which induced approximately 1.4 μm Ni3Fe alloy layer in this region. The carbide containing layer extended to about 7 μm underneath the Ni3Fe layer. The presence of graphite dramatically changes the mechanisms of corrosion attack in Hastelloy N in molten FLiBe salt. Evaluated by in terms of the depth of attack, graphite clearly accelerates corrosion, but the results appear to indicate that the formation of Cr23C6 phase might stabilize the Cr and mitigate its dissolution in molten FLiBe salt.« less

  12. Area-selected Ion Milling for Reflection Wavefront Error Correction of Soft X-ray Multilayer Mirrors

    NASA Astrophysics Data System (ADS)

    Tsuru, Toshihide; Sakai, Yu; Hatano, Tadashi; Yamamoto, Masaki

    2010-06-01

    For accurate reflection wavefront error correction of imaging soft X-ray multilayer mirrors, a period-by-period ion milling system was developed. A stable and homogenized radial distribution of ion beam was realized for an ion milling over a whole area of 100 mm-wide multilayer. To demonstrate the wavefront error correction principle, a dielectric multilayer mirror for visible light was locally milled by our system. Wavefront as measured by a phase shifting interferometer showed the reflection phase of local milling multilayer advanced. Area-selected ion millings with mask templates made of Mo and Si, and by photoresist contact masks were carried out. Although striped patterns generated by the difference of spectroscopic reflectance between Mo and Si were observed at peripherals of milling area when templates were used, a clear and sharp edge pattern was obtained with contact mask. Soft X-ray reflectance of a Mo/Si multilayer milled with photoresist contact mask showed good feasibility of precise wavefront error correction of multilayers. These results proved our phase correction method is promising and practical for the 0.1 nm-period correction of soft X-ray multilayer mirror.

  13. Soft-x-ray polarimeter with multilayer optics: complete analysis of the polarization state of light.

    PubMed

    Schäfers, F; Mertins, H C; Gaupp, A; Gudat, W; Mertin, M; Packe, I; Schmolla, F; Di Fonzo, S; Soullié, G; Jark, W; Walker, R; Le Cann, X; Nyholm, R; Eriksson, M

    1999-07-01

    The design of a versatile high-precision eight-axis ultrahigh-vacuum-compatible polarimeter is presented. This multipurpose instrument can be used as a self-calibrating polarization detector for linearly and circularly polarized UV and soft-x-ray light. It can also be used for the characterization of reflection or transmission properties (reflectometer) or polarizing and phase-retarding properties (ellipsometer) of any optical element. The polarization properties of Mo/Si, Cr/C, Cr/Sc, and Ni/Ti multilayers used in this polarimeter as polarizers in transmission and as analyzers in reflection have been investigated theoretically and experimentally. In the soft-x-ray range, close to the p edges of Sc, Ti, and Cr, resonantly enhanced phase retardation of the transmission polarizers of as much as 18 degrees has been measured. With these newly developed optical elements the complete polarization analysis of soft-x-ray synchrotron radiation can be extended to the water-window range from 300 to 600 eV. PMID:18323885

  14. ArFi lithogrphy optimization for thin OMOG reticle with fast aerial imaging

    NASA Astrophysics Data System (ADS)

    Cohen, Yaron; Finders, Jo; Mangan, Shmoolik; Englard, Ilan; Mouraille, Orion; Janssen, Maurice; Miyazaki, Junji; Connolly, Brid; Kojima, Yosuke; Higuchi, Masaru

    2012-03-01

    As half pitch shrinks to sub 20nm dimensions, the latest hybrid IC (integrated circuit) designs include a greater number of features that approach the resolution limits of the scanner than in the previous generation of IC designs. This trend includes stringent design rules and complex, ever smaller optical proximity correction (OPC) structures. In this regime, a new type of mask, known as opaque MoSi on glass (OMOG), has been introduced to overcome the shortcomings of the well-established phase shift masks (PSM). As for lithography, scanner and mask determine ultimate intra-field performance as one approaches scanner resolution limits. Holistic lithography techniques have been developed to optimize the interrelated mask and scanner effects on critical dimension uniformity (CDU) and common process window (PW) for the most demanding sub 20nm node features. This paper presents an efficient and production worthy methodology for evaluating the CDU, PW, and 3D effect fingerprints of the latest immersion scanner and thin OMOG masks, and minimizing them using high-order optimizers of the latest holistic ArFi lithography.

  15. Repair of phase defects in extreme-ultraviolet lithography mask blanks

    SciTech Connect

    Hau-Riege, Stefan P.; Barty, Anton; Mirkarimi, Paul B.; Baker, Sherry; Coy, Michael A.; Mita, Masaaki; Robertson, Vernon E.; Liang, Ted; Stivers, Alan

    2004-12-01

    Phase defects that introduce errors in the printed image are one of the major yield limiters for reticles in extreme-ultraviolet lithography. The basis for a reticle is a mask blank, consisting of an ultra-low-expansion substrate and a reflective multilayer stack that is made up of Mo and Si. A potential methodology for repairing phase defects in these mask blanks is to locally irradiate it with a high-resolution electron beam to induce structural deformations that cancel out the distortion of the multilayer. We present experimental and modeling results that show that the interaction of an electron beam with a mask blank can only be understood when the contraction of the multilayer through silicide formation and substrate compaction, as well as the mechanical response of the mask blank, are considered. One of the consequences is that electron beams with energies around 10 keV that are less than 20 nm in diameter induce depressions in multilayers made up of 50 Mo/Si bilayers that have a surprisingly large diameter of about a micrometer. Our models suggest that these unacceptably large diameters can only be reduced if the compaction of the substrate is prevented.

  16. The CDX-U multilayer mirror array

    NASA Astrophysics Data System (ADS)

    Iovea, M.; Stutman, D.; Soukhanovskii, V.; Finkenthal, M.; Munsat, T.; Menard, J.; Kaita, R.; Majeski, R.; Jones, B.; Spaleta, J.; Taylor, G.; Efthimion, P.; Hoffman, D.

    1999-11-01

    A prototype array of miniature, multilayer mirror/AXUV photodiode monochromators is being installed on CDX-U for fast, spectrally resolved imaging of the USXR impurity line emission. At present, the array is equipped with ten Mo/Si mirrors tuned to the intrinsic O VI line emission at 170 Å. The O distribution thus obtained is used in conjunction with other profile diagnostics on CDX-U to assess the intrinsic impurity transport, while the emission fluctuations are used to trace the MHD activity outside the q=1 surface. In a second stage of the research, the array will be equipped with Ni/C mirrors tuned to the 2p-3d Li-like Ne transitions at 98 Å, for time-dependent transport measurements using injected Ne gas. Further on, the array will be used to measure the Li distribution in CDX-U, during planned liquid Li divertor experiments. Initial results obtained with the array in the O VI configuration will be presented. Work supported by DoE grant No. DE-FG02-86ER52314ATDoE and DoE contract No. DE-AC02-76-CHO-3073.

  17. Femtosecond laser ablation of CuxZr1-x bulk metallic glasses: A molecular dynamics study

    NASA Astrophysics Data System (ADS)

    Marinier, Sébastien; Lewis, Laurent J.

    2015-11-01

    Molecular-dynamics simulations combined with a two-temperature model are used to study laser ablation in CuxZr1-x (x =0.33 ,0.50 ,0.67 ) metallic glasses as well as crystalline CuZr2 in the C11b (MoSi2) structure. Ablation thresholds are found to be 430 ±10 ,450 ±10 ,510 ±10 , and 470 ±10 J/m 2 for a-Cu2Zr , a-CuZr, a-CuZr2, and c-CuZr2, respectively. The larger threshold in amorphous CuZr2 results from a weaker electron-phonon coupling and thus longer electron-ion equilibration time. We observe that the velocity of the pressure waves in the amorphous samples is not affected by the fluence, in contrast to the crystal; this is due to differences in the behavior of the shear modulus with increasing pressure. The heat-affected zone in the different systems is characterized in terms of the melting depth as well as inelastic deformations. The melting depth is found to be smaller in the crystal than in the amorphous targets because of its higher melting temperature. The inelastic deformations are investigated in terms of the von Mises shear strain invariant ηMises; the homogeneous nucleation of shear transformation zones is observed in the glass as reported in previous theoretical and experimental studies. The coalescence of the shear transformation zones is also found at higher fluence.

  18. Influence of particle bombardment on microstructure and internal stresses of refractory metal suicides on silicon

    NASA Astrophysics Data System (ADS)

    Hardtke, Ch.; Schilling, W.; Ullmaier, H.

    1991-07-01

    First results on microstructural changes and stress relaxation in thin refractory metal suicide films (TaSi 2 and MoSi 2) caused by particle bombardment are reported. The polycrystalline films had initial tensile stresses of some 10 9 Pa. Exposed to irradiation with Ge ions of 400 keV, both suicides showed a similar stress relaxation behaviour as a function of dose. During room-temperature implantation the initial tensile stress rapidly decreased and turned into compressive stress. Continuous irradiation partly relaxed the compressive stress and resulted in a saturation value of some -10 8 Pa. With increasing implantation temperature, the buildup of compressive stress gradually vanished, leaving only the initial decrease of tensile stress which finally approached zero. Based on microstructural investigations (TEM and X-ray diffraction) it is proposed to explain this behaviour by the combined action of two processes: relaxation of tensile stress by a volume increase due to irradiation-induced amorphization, and Frenkel defect production and relaxation of compressive stress by irradiation-induced densification of amorphous regions and/or Frenkel defect elimination.

  19. X-ray beamsplitter

    DOEpatents

    Ceglio, N.M.; Stearns, D.G.; Hawryluk, A.M.; Barbee, T.W. Jr.

    1987-08-07

    An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5--50 pairs of alternate Mo/Si layers with a period of 20--250 A. The support membrane is 10--200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window. 6 figs.

  20. A Preliminary Investigation of the Cr3Si-Mo Pseudo-Binary Phase Diagram

    NASA Technical Reports Server (NTRS)

    Dickerson, R. M.; Raj, S. V.; Locci, I. E.

    1995-01-01

    An investigation was undertaken to study the phase relations in Cr3Si alloyed with Mo varying from 10 to 83.5 wt. % of the material. Specimens were prepared from arc-melted buttons that were subsequently heat treated at 1673 K for 200 h and air quenched to room temperature to structures. Alloys containing more than 20 wt. % MO were primarily two-phase materials of M3Si and M5Si3, where M is (Cr,Mo). Three alloys contained less than 5% of a third phase, which also had the M5Si3 crystal structure. Differential thermal analysis (DTA) was performed on several specimens at temperatures up to 2073 K in order to determine a solidus curve for the M3Si phase. Since only one DTA peak was observed in each alloy, the M5Si3 phase must melt above 2073 K, the maximum temperature examined. A preliminary pseudo-binary phase diagram for (Cr,Mo)3Si and a portion of the 1673 K isothermal section of the Cr-Mo-Si ternary phase diagram are presented.

  1. Quantum confinement in semiconductor nanofilms: Optical spectra and multiple exciton generation

    NASA Astrophysics Data System (ADS)

    Khmelinskii, Igor; Makarov, Vladimir I.

    2016-04-01

    We report optical absorption and photoluminescence (PL) spectra of Si and SnO2 nanocrystalline films in the UV-vis-NIR range, featuring discrete bands resulting from transverse quantum confinement, observed in the optical spectra of nanofilms for the first time ever. The film thickness ranged from 3.9 to 12.2 nm, depending on the material. The results are interpreted within the particle-in-a-box model, with infinite walls. The calculated values of the effective electron mass are independent on the film thickness and equal to 0.17mo (Si) and 0.21mo (SnO2), with mo the mass of the free electron. The second calculated model parameter, the quantum number n of the HOMO (valence band), was also thickness-independent: 8.00 (Si) and 7.00 (SnO2). The transitions observed in absorption all start at the level n and correspond to Δn = 1, 2, 3, …. The photoluminescence bands exhibit large Stokes shifts, shifting to higher energies with increased excitation energy. In effect, nanolayers of Si, an indirect-gap semiconductor, behave as a direct-gap semiconductor, as regards the transverse-quantized level system. A prototype Si-SnO2 nanofilm photovoltaic cell demonstrated photoelectron quantum yields achieving 2.5, showing clear evidence of multiple exciton generation, for the first time ever in a working nanofilm device.

  2. Magnetic properties and structure of nanocrystalline FINEMET alloys with various iron contents

    NASA Astrophysics Data System (ADS)

    Mushnikov, N. V.; Potapov, A. P.; Shishkin, D. A.; Protasov, A. V.; Golovnya, O. A.; Shchegoleva, N. N.; Gaviko, V. S.; Shunyaev, K. Yu.; Bykov, V. A.; Starodubtsev, Yu. N.; Belozerov, V. Ya.

    2015-07-01

    The effect of the composition and annealing temperature on the structure and magnetic properties of soft magnetic nanocrystalline Fe-Cu-Nb-Mo-Si-B alloys has been studied. An increase in the iron content compared to that in the traditional FINEMET alloy is shown to allow one to increase the magnetic induction by 18% at a coercive force of no less than 6 A/m. It has been found that, along with the amorphous phase, rapidly quenched ribbons of alloys enriched in Fe contain crystalline α-Fe-based phase precipitates, the (100) crystallographic directions of which are perpendicular to the ribbon plane. Thermomagnetic analysis and differential scanning calorimetry were used to determine the temperatures of structural and magnetic phase transformations of the alloys with different iron contents. It was found that the separation of amorphous phase into areas of different compositions precedes the precipitation of nano-sized soft magnetic Fe-Si phase grains in the rapidly quenched iron-enriched ribbons.

  3. Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

    NASA Astrophysics Data System (ADS)

    Edinger, Klaus; Boegli, Volker; Degel, Wolfgang

    2005-06-01

    With the ever decreasing feature sizes and increasing cost of current and future photolithographic masks the repair of these masks becomes a substantial factor of the total mask production cost. In a collaborative effort NaWoTec, Carl Zeiss Nano Technology Systems Division (NTS) and Carl Zeiss Semiconductor Metrology Systems Division (SMS) have built an electron beam based mask repair tool capable of processing a wide variety of mask types, such as quartz binary masks, phase shift masks, EUV masks, and e-beam projection stencil masks. In this paper, besides a brief overview of the tool platform, we will present the automated repair of clear and opaque defects on Cr and MoSi quartz masks. Emphasis will be put onto the resolution and the speed of the repair procedure and the high grade of automation and integration achievable in the repair of high-end photomasks. An outlook against the ITRS requirements and the extendibility of the presented solution to further technology nodes will be given in the summary.

  4. Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

    NASA Astrophysics Data System (ADS)

    Rakowski, R.; Bartnik, A.; Fiedorowicz, H.; de Gaufridy de Dortan, F.; Jarocki, R.; Kostecki, J.; Mikołajczyk, J.; Ryć, L.; Szczurek, M.; Wachulak, P.

    2010-12-01

    The paper describes a debris-free, efficient laser-produced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its properties and spectroscopic signatures are characterized and discussed. The spatio-spectral features of the EUV emission are investigated. We show a large body of results related to the intensity and brightness of the EUV emission, its spatial, temporal, and angular behavior and the effect of the repetition rate as well. A conversion efficiency of laser energy into EUV in-band energy at 13.5 nm of 0.42% has been gained. The electron temperature and electron density of the source were estimated by means of a novel method using the FLY code. The experimental data and the Hullac code calculations are compared and discussed. The source is well suited for EUV metrology purposes. The potential of the source for application in EUV lithography was earlier demonstrated in the optical characterization of Mo/Si multi-layer mirrors and photo-etching of polymers.

  5. X-ray beamsplitter

    DOEpatents

    Ceglio, Natale M.; Stearns, Daniel S.; Hawryluk, Andrew M.; Barbee, Jr., Troy W.

    1989-01-01

    An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5-50 pairs of alternate Mo/Si layers with a period of 20-250 A. The support membrane is 10-200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window.

  6. Erosive wear of selected materials for fossil energy applications

    SciTech Connect

    Adler, Thomas A.; Rawers, James C.; Tylczak, Joseph H.; Hawk, Jeffrey A.

    2001-01-01

    A number of materials have been evaluated to determine their erosion resistance for fossil energy applications. This is part of a larger program to study wear and corrosion at Albany Research Center. This paper will present the results for some of these materials, including FeAl, FeAl cermets, WC-Co cemented carbides, Si3N4-MoSi2, Si3N4, Stellite 6B, white cast irons and 440C steel. Trends in erosion rates due to material properties and erosive conditions will be presented. FeAl cermets performed well compared to the WC-Co cemented carbides. The interparticle spacing of the WC-Co cemented carbides correlated with the erosion rate. The erosion rate of the WC-Co cemented carbides decreased as the interparticle spacing decreased. It is important to realize that erosion resistance is not an intrinsic material property, but is a system response. A change in the wear environment can significantly alter the relative rankings of materials with respect to their wear rate. For example, at relatively low velocities, the carbides in the white cast irons are more erosion resistant than the matrix, while at higher velocities the matrix is more erosion resistant.

  7. Lasers, extreme UV and soft X-ray

    SciTech Connect

    Nilsen, Joseph

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA) laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.

  8. Structural and electronic properties of XSi{sub 2} (X = Cr, Mo, and W)

    SciTech Connect

    Shugani, Mani; Aynyas, Mahendra; Sanyal, S. P.

    2015-07-15

    The structural and electronic properties of metal silicides XSi{sub 2} (X = Cr, Mo, and W), which crystallize in tetragonal structure, are investigated systematically using the first-principle density functional theory. The total energies are computed as a function of volume and fitted to the Birch equation of state. The ground-state properties such as equilibrium lattice constants a{sub 0} and c{sub 0}, bulk modulus B, its pressure derivative B, B′, and the density of states at the Fermi level, N(E{sub F}), are calculated and compared with other experimental and theoretical results, showing good agreement. The calculated band structure indicates that XSi{sub 2} compounds are semimetallic in nature. From the present study, we predict the structural and electronic properties of CrSi{sub 2} in the tetragonal phase and indicate that CrSi{sub 2} is energetically more stable than MoSi{sub 2} and WSi{sub 2}. Analyzing the bonding properties of the three metal silicides, we observe that WSi{sub 2} has a strong covalent bonding due to W 5d electrons.

  9. Microstructures and oxidation behavior of some Molybdenum based alloys

    SciTech Connect

    Ray, Pratik Kumar

    2011-01-01

    The advent of Ni based superalloys revolutionized the high temperature alloy industry. These materials are capable of operating in extremely harsh environments, comprising of temperatures around 1050 C, under oxidative conditions. Demands for increased fuel efficiency, however, has highlighted the need for materials that can be used under oxidative conditions at temperatures in excess of 1200 C. The Ni based superalloys are restricted to lower temperatures due to the presence of a number of low melting phases that melt in the 1250 - 1450 C, resulting in softening of the alloys above 1000 C. Therefore, recent research directions have been skewed towards exploring and developing newer alloy systems. This thesis comprises a part of such an effort. Techniques for rapid thermodynamic assessments were developed and applied to two different systems - Mo-Si alloys with transition metal substitutions (and this forms the first part of the thesis) and Ni-Al alloys with added components for providing high temperature strength and ductility. A hierarchical approach towards alloy design indicated the Mo-Ni-Al system as a prospective candidate for high temperature applications. Investigations on microstructures and oxidation behavior, under both isothermal and cyclic conditions, of these alloys constitute the second part of this thesis. It was seen that refractory metal systems show a marked microstructure dependence of oxidation.

  10. Novel Accident-Tolerant Fuel Meat and Cladding

    SciTech Connect

    Robert D. Mariani; Pavel G Medvedev; Douglas L Porter; Steven L Hayes; James I. Cole; Xian-Ming Bai

    2013-09-01

    A novel accident-tolerant fuel meat and cladding are here proposed. The fuel meat design incorporates annular fuel with inserts and discs that are fabricated from a material having high thermal conductivity, for example niobium. The inserts are rods or tubes. Discs separate the fuel pellets. Using the BISON fuel performance code it was found that the peak fuel temperature can be lowered by more than 600 degrees C for one set of conditions with niobium metal as the thermal conductor. In addition to improved safety margin, several advantages are expected from the lower temperature such as decreased fission gas release and fuel cracking. Advantages and disadvantages are discussed. An enrichment of only 7.5% fully compensates the lost reactivity of the displaced UO2. Slightly higher enrichments, such as 9%, allow uprates and increased burnups to offset the initial costs for retooling. The design has applications for fast reactors and transuranic burning, which may accelerate its development. A zirconium silicide coating is also described for accident tolerant applications. A self-limiting degradation behavior for this coating is expected to produce a glassy, self-healing layer that becomes more protective at elevated temperature, with some similarities to MoSi2 and other silicides. Both the fuel and coating may benefit from the existing technology infrastructure and the associated wide expertise for a more rapid development in comparison to other, more novel fuels and cladding.

  11. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Wachulak, Przemysław; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Mirosław; Adjei, Daniel; Ahad, Inam Ul; Ayele, Mesfin G.; Fok, Tomasz; Szczurek, Anna; Torrisi, Alfio; Wegrzyński, Łukasz; Fiedorowicz, Henryk

    2015-05-01

    Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) developed in our laboratory for application in various areas of technology and science are presented. The sources are based on a laser-irradiated gas puff target approach. The targets formed by pulsed injection of gas under high-pressure are irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating pulses with time duration from 1ns to 10ns and energies from 0.5J to 10J at 10Hz repetition rate. The gas puff targets are produced using a double valve system equipped with a special nozzle to form a double-stream gas puff target which secures high conversion efficiency without degradation of the nozzle. The use of a gas puff target instead of a solid target makes generation of laser plasmas emitting soft x-rays and EUV possible without target debris production. The sources are equipped with various optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, a "lobster eye" type grazing incidence multi-foil mirror, and an ellipsoidal mirror with Mo/Si multilayer coating, to collect soft x-ray and EUV radiation and form the radiation beams. In this paper new applications of these sources in various fields, including soft x-ray and EUV imaging in nanoscale, EUV radiography and tomography, EUV materials processing and modification of polymer surfaces, EUV photoionization of gases, radiobiology and soft x-ray contact microscopy are reviewed.

  12. Charge transfer on the metallic atom-pair bond, and the crystal structures adopted by intermetallic compounds.

    PubMed

    Rajasekharan, T; Seshubai, V

    2012-01-01

    It has been argued in our recent papers that the heat of formation of intermetallic compounds is mostly concentrated in the nearest neighbor unlike atom-pair bonds, and that the positive term in Miedema's equation is associated with charge transfer on the bond to maintain electroneutrality. In this paper, taking examples of some well populated crystal-structure types such as MgCu(2), AsNa(3), AuCu(3), MoSi(2) and SiCr(3) types, the effect of such charge transfer on the crystal structures adopted by intermetallic compounds is examined. It is shown that the correlation between the observed size changes of atoms on alloying and their electronegativity differences is supportive of the idea of charge transfer between atoms. It is argued that the electronegativity and valence differences need to be of the required magnitude and direction to alter, through charge transfer, the elemental radius ratios R(A)/R(B) to the internal radius ratios r(A)/r(B) allowed by the structure types. Since the size change of atoms on alloying is highly correlated to how different R(A)/R(B) is from the ideal radius ratio for a structure type, the lattice parameters of intermetallic compounds can be predicted with excellent accuracy knowing R(A)/R(B). A practical application of the approach developed in our recent papers to superalloy design is presented. PMID:22186292

  13. Synthesis and design of silicide intermetallic materials. 1998 annual progress report

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Butt, D.P.; Park, Y.; Vaidya, R.U.; Hollis, K.J.; Kung, H.H.

    1999-03-01

    The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the US processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive US processing industries. The program presently has a number of developing industrial connections, including a CRADA with Johns Manville Corporation targeted at the area of MoSi{sub 2}-based high temperature materials and components for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. With Combustion Technology Inc., they are developing silicide-based periscope sight tubes for the direct observation of glass melts. With Accutru International Corporation, they are developing silicide-based protective sheaths for self-verifying temperature sensors which may be used in glass furnaces and other industrial applications. The progress made on the program in this period is summarized.

  14. Efficiency calibration of the first multilayer-coated holographic ion-etched flight grating for a sounding rocket high-resolution spectrometer

    SciTech Connect

    Kowalski, Michael P.; Barbee, Troy W. Jr.; Heidemann, Klaus F.; Gursky, Herbert; Rife, Jack C.; Hunter, William R.; Fritz, Gilbert G.; Cruddace, Raymond G.

    1999-11-01

    We have fabricated the four flight gratings for a sounding rocket high-resolution spectrometer using a holographic ion-etching technique. The gratings are spherical (4000-nm radius of curvature), large (160 mmx90 mm), and have a laminar groove profile of high density (3600 grooves/mm). They have been coated with a high-reflectance multilayer of Mo/Si. Using an atomic force microscope, we examined the surface characteristics of the first grating before and after multilayer coating. The average roughness is approximately 3 Aa rms after coating. Using synchrotron radiation, we completed in efficiency calibration map over the wavelength range 225-245 Aa. At an angle of incidence of 5 degree sign and a wavelength of 232 Aa, the average efficiency in the first inside order is 10.4{+-}0.5%, and the derived groove efficiency is 34.8{+-}1.6%. These values exceed all previously published results for a high-density grating. (c) 1999 Optical Society of America.

  15. X-ray optics for laser-plasma sources: Aplications of intense SXR and EUV radiation pulses

    NASA Astrophysics Data System (ADS)

    Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Anna; Szczurek, Mirosław; Wachulak, Przemysław; Pina, Ladislav

    2012-05-01

    In this work we present a short review of SXR and EUV optics that have been designed and developed for experiments concerning material processing and imaging, using a laser-plasma radiation source based on a gas puff target. Three different kinds of mirrors employed as the EUV collectors are presented: the grazing incidence axisymmetrical ellipsoidal mirror, the grazing incidence multifoil mirror, and the ellipsoidal mirror with Mo/Si multilayer coating. Experiments concerning characterization of the mirrors were performed using EUV radiation from Kr or Xe plasmas produced in a double stream gas puff target irradiated with Nd:YAG laser pulses (4ns, 0.8 J, 10 Hz). Intensity of the focused radiation was sufficient for micromachining of organic polymers and surface modification of organic and inorganic solids. Different kinds of micro-and nanostructures created in near-surface layers of different kinds polymers were obtained. Significant differences were revealed in XPS spectra acquired for irradiated and not irradiated polymers.

  16. Corrosive sliding wear behavior of laser clad Mo 2Ni 3Si/NiSi intermetallic coating

    NASA Astrophysics Data System (ADS)

    Lu, X. D.; Wang, H. M.

    2005-05-01

    Many ternary metal silicides such as W 2Ni 3Si, Ti 2Ni 3Si and Mo 2Ni 3Si with the topologically closed-packed (TCP) hP12 MgZn 2 type Laves phase crystal structure are expected to have outstanding wear and corrosion resistance due to their inherent high hardness and sluggish temperature dependence and strong atomic bonds. In this paper, Mo 2Ni 3Si/NiSi intermetallic coating was fabricated on substrate of an austenitic stainless steel AISI321 by laser cladding using Ni-Mo-Si elemental alloy powders. Microstructure of the coating was characterized by optical microscopy (OM), scanning electron microscopy (SEM), X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDS). Wear resistance of the coating is evaluated under corrosive sliding wear test condition. Influence of corrosion solutions on the wear resistance of the coating was studied and the wear mechanism was discussed based on observations of worn surface morphology. Results showed that the laser clad Mo 2Ni 3Si/NiSi composite coating have a fine microstructure of Mo 2Ni 3Si primary dendrites and the interdendritic Mo 2Ni 3Si/NiSi eutectics. The coating has excellent corrosive wear resistance compared with austenitic stainless steel AISI321 under acid, alkaline and saline corrosive environments.

  17. Microstructural evolution and mechanical behavior of nickel-based superalloy 625 made by selective laser melting

    NASA Astrophysics Data System (ADS)

    Witkin, David B.; Adams, Paul; Albright, Thomas

    2015-03-01

    The mechanical properties and microstructures of Selective Laser Melted (SLM) alloy 625 procured from different suppliers were compared. The post-SLM process of hot isostatic pressing (HIP) led to a relatively coarse recrystallized gamma matrix phase that was similar in all the suppliers' materials, resulting in nearly identical tensile properties. These similarities obscure significant differences between them with respect to the population of second phase particles, which consisted of carbides or Laves phase. During solidification, the final liquid phase is concentrated in Nb, Mo, Si and C, and leads to L --> γ + carbide/Laves eutectic reactions. Secondary particles are very small prior to HIP and their composition has not been analyzed yet, but are limited to the fine-grained eutectic regions of the material prior to HIP. During HIP the gamma phase recrystallizes to remove the original as-solidified SLM microstructure, but secondary particles nucleate and grow where their elemental constituents first solidified, leading to a non-homogeneous distribution. Quasi-static tensile properties do not appear to be sensitive to these differences, but it is likely that other mechanical properties will be affected, especially fatigue and fracture behavior. Surface roughness, large grain size, and pores and voids left unhealed by the HIP cycle will also influence fatigue and fracture. Surface roughness and porosity in particular are features that could be improved by implementing novel approaches to laser processing in SLM.

  18. Thermodynamic modeling and kinetics simulation of precipitate phases in AISI 316 stainless steels

    NASA Astrophysics Data System (ADS)

    Yang, Y.; Busby, J. T.

    2014-05-01

    This work aims at utilizing modern computational microstructural modeling tools to accelerate the understanding of phase stability in austenitic steels under extended thermal aging. Using the CALPHAD approach, a thermodynamic database OCTANT (ORNL Computational Thermodynamics for Applied Nuclear Technology), including elements of Fe, C, Cr, Ni, Mn, Mo, Si, and Ti, has been developed with a focus on reliable thermodynamic modeling of precipitate phases in AISI 316 austenitic stainless steels. The thermodynamic database was validated by comparing the calculated results with experimental data from commercial 316 austenitic steels. The developed computational thermodynamics was then coupled with precipitation kinetics simulation to understand the temporal evolution of precipitates in austenitic steels under long-term thermal aging (up to 600,000 h) at a temperature regime from 300 to 900 °C. This study discusses the effect of dislocation density and difusion coefficients on the precipitation kinetics at low temperatures, which shed a light on investigating the phase stability and transformation in austenitic steels used in light water reactors.

  19. Analysis of a New High-Toughness Ultra-high-Strength Martensitic Steel by Transmission Electron Microscopy and Atom Probe Tomography

    NASA Astrophysics Data System (ADS)

    Hartshorne, Matthew I.; McCormick, Caroline; Schmidt, Michael; Novotny, Paul; Isheim, Dieter; Seidman, David N.; Taheri, Mitra L.

    2016-04-01

    The microstructure of a new martensitic high-strength steel (Fe-0.40C-3.81Ni-1.31Cr-1.50Si-0.75Mn-0.52Mo-0.51Cu-0.30V) with high fracture toughness is characterized by transmission electron microscopy and atom probe tomography (APT). MC, M6C, and M23C6 precipitates form inside the martensitic lath matrix. The fracture toughness is insensitive to the dissolution of M23C6 precipitates at austenitizing temperatures above 1164 K (891 °C). APT reveals that solute segregation at the prior austenite grain boundaries (PAGB) is not uniform, with C, Mo, Si, Ni, and/or P enrichment varying at different areas of the PAGB. Si depletion is detected in the same area as the highest C enrichment. Carbon also segregates at lath boundaries. Segregation of C indicates the presence of retained austenite films at both PAGB and lath boundaries. Regions enriched in C up to 10 pct were found within the laths; however, no regions were enriched to the level expected of cementite or ɛ-carbide. The observed C distribution and high fracture toughness indicates that the tempering behavior is significantly different than that observed in 300M steel. The effect of Si, Ni, and Cu on the formation and stabilization of the regions of C enrichment and retained austenite require further study, as it may be key to the increased toughness.

  20. Microstructure of RERTR DU-Alloys Irradiated with Krypton Ions

    SciTech Connect

    J. Gan; D. Keiser; D. Wachs; B. Miller; T. Allen; M. Kirk; J. Rest

    2009-11-01

    Fuel development for reduced enrichment research and test reactor (RERTR) program is tasked with the development of new low enrichment uranium fuels that can be employed to replace existing high enrichment uranium fuels currently used in many research and test reactors worldwide. Radiation stability of the interaction product formed at fuel-matrix interface has a strong impact on fuel performance. Three depleted uranium alloys are cast that consist of the following 5 phases of interest to be investigated: U(Si,Al)3, (U,Mo)(Si,Al)3, UMo2Al20, U6Mo4Al43 and UAl4. Irradiation of TEM disc samples with 500 keV Kr ions at 200?C to high doses up to ~100 dpa were conducted using an intermediate voltage electron microscope equipped with an ion accelerator. The irradiated microstructure of the 5 phases is characterized using transmission electron microscopy. The results will be presented and the implication of the observed irradiated microstructure on the fuel performance will be discussed.

  1. The joint astrophysical plasmadynamic experiment (J-PEX) high-resolution EUV spectrometer: diffraction grating efficiency

    NASA Astrophysics Data System (ADS)

    Kowalski, M. P.; Berendse, F. B.; Barbee, T. W., Jr.; Hunter, W. R.; Heidemann, K. F.; Lenke, R.; Seifert, A.; Cruddace, R. G.

    2006-06-01

    We have fabricated five new holographic ion-etched polymer-coated gratings for a reflight on a sounding rocket of the J-PEX high-resolution EUV spectrometer. The gratings are parabolic (nominal 2000-mm focal length), large (160 mm x 90 mm), and have a blazed groove profile of high density (3600 grooves/mm at the vertex). They have been coated with a high-reflectance multilayer of Mo/Si/C. Using an atomic force microscope, we examined grating topography before multilayer coating. The surface roughness is 2 angstrom rms and the blaze angle is near the target value of 2.4°. Using synchrotron radiation, we completed an efficiency calibration map of each multilayer-coated grating over the wavelength range 220-245 angstrom. At an angle of incidence of 5°, the average efficiency in the first inside order peaks near 234 angstrom. The average peak efficiency is 12.3 +/- 1.0% for Grating 1, 12.6 +/- 2.4% for Grating 2, 12.6 +/- 1.8% for Grating 3, 14.1 +/- 3.0% for Grating 4, and 13.0 +/- 1.0% for Grating 5. The derived groove efficiency averaged over all gratings is approximately 50%, which meets our goals. Refined models of the multilayer gratings are required to resolve remaining issues.

  2. Efficiency Calibration of the Multilayer-coated Holographic Ion-Etched Flight Gratings for the J-PEX Sounding Rocket Spectrometer

    NASA Astrophysics Data System (ADS)

    Kowalski, M. P.; Barbee, T. W., Jr.; Heidemann, K. F.; Gursky, H.; Rife, J. C.; Hunter, W. R.; Fritz, G. G.; Cruddace, R. G.

    1999-05-01

    In the extreme ultraviolet, high spectral resolution and sensitivity are required for measuring linewidths and Doppler shifts and for resolving the many weak lines, absorption edges and other features that may appear in the spectra of astrophysical sources. For over a decade we have been pursuing the goal of achieving high effective area at normal-incidence by using ultra-smooth holographic ion-etched gratings that have been coated with high-reflectance multilayers. The four flight gratings for the J-PEX sounding rocket spectrometer have been fabricated using the holographic ion-etching technique. The gratings are spherical (4000 mm radius of curvature), large (160 mm x 90 mm), and have a laminar groove profile of high density (3600 grooves/mm). They have been coated with a high-reflectance multilayer of Mo/Si. We present the results of grating surface measurements, made using an atomic force microscope. The average roughness of the first grating is about 3 A rms after coating. We also present efficiency calibration maps, made over the wavelength range 225-245 A using synchrotron radiation. At an angle of incidence of 5 and a wavelength of 234 A, the average efficiency of the first grating in the first inside order is 10.4 +/- 0.5 the derived groove efficiency is 34.8 +/- 1.6 exceed all previously published results for a high density grating.

  3. Development of a reflectometer for a large EUV mirror in NewSUBARU

    NASA Astrophysics Data System (ADS)

    Iguchi, Haruki; Hashimoto, Hiraku; Kuki, Masaki; Harada, Tetsuo; Watanabe, Takeo; Kinoshita, Hiroo

    2015-07-01

    In extreme-ultraviolet (EUV) lithography, mirror optics is coated with a Mo/Si multilayer film. Since throughput of an EUV system is directly depends on the multilayer film reflectance, we have developed a mask reflectometer to evaluate the reflectance in BL-10 beamline of the NewSUBARU synchrotron facility. In particular, the EUV output power from a EUV light source relates to the reflectance of a collector mirror. Thus, we installed a new large reflectometer in BL-10 beamline to evaluate the collector mirror reflectance. The reflectometer can measure a mirror with a diameter of up to 800 mm, a thickness of 250 mm, and a weight of 50 kg. The entire sample surface can be measured in spherical coordinate using vertical γ and rotation Φ axis. Each axis positions are measured with optical encoders precisely, and are controlled in closed-loop operation. We measured reflectance of an EUV mask using the large reflectometer and the mask reflectometer. The peak reflectance was well consisted with the two reflectometer within 0.1%. The large reflectometer has high reproducibility of the peak reflectance measurement.

  4. Focus ion beam-induced mechanical stress switching in an ultra-fast resistive switching device

    NASA Astrophysics Data System (ADS)

    Yang, Xiang

    2016-06-01

    The Mo/Si3N4:Pt/Pt nanometallic resistive switching devices with ultra-fast write/erase speed (<50 ns) were fabricated. Other than conventional electrical switching, a mechanical stress-induced switching was demonstrated. Such mechanical stress was provided by momentum transfer of 30 keV Ga+ ions in a focus ion beam system, enabling a one-way high resistance state (HRS) to low resistance state (LRS) transition. The capability of mechanical stress switching provides evidence that electron trapping/detrapping mechanism is responsible for nanometallic resistive switching. It was further demonstrated that HRS (trapping state) is a meta-stable state, while LRS (detrapping state) is a stable state. Strong mechanical stress facilitates local bond distortion in dielectric films and thus lowers the energy barrier between HRS and LRS, eventually leading to a barrier-less state transition. A quantitative model based on stress-mediated parallel conduction paths were established to provide a more accurate description of the resistive switching devices.

  5. Method to adjust multilayer film stress induced deformation of optics

    DOEpatents

    Mirkarimi, Paul B.; Montcalm, Claude

    2000-01-01

    A buffer-layer located between a substrate and a multilayer for counteracting stress in the multilayer. Depositing a buffer-layer having a stress of sufficient magnitude and opposite in sign reduces or cancels out deformation in the substrate due to the stress in the multilayer. By providing a buffer-layer between the substrate and the multilayer, a tunable, near-zero net stress results, and hence results in little or no deformation of the substrate, such as an optic for an extreme ultraviolet (EUV) lithography tool. Buffer-layers have been deposited, for example, between Mo/Si and Mo/Be multilayer films and their associated substrate reducing significantly the stress, wherein the magnitude of the stress is less than 100 MPa and respectively near-normal incidence (5.degree.) reflectance of over 60% is obtained at 13.4 nm and 11.4 nm. The present invention is applicable to crystalline and non-crystalline materials, and can be used at ambient temperatures.

  6. Microstructure and Properties of HVOF-Sprayed Ni-50Cr Coatings

    SciTech Connect

    Joel A. Simpson; Terry C. Totemeier; Richard N. Wright

    2006-06-01

    Thermal spray coatings represent a potential cost-effective means of protecting structural components in advanced fossil energy systems. Previous work at the INL has focused on relationships between thermal spray processing conditions, structure, and properties in alumina- and silica-forming coatings, namely Fe3Al, FeAl, and Mo-Si-B alloys. This paper describes the preparation and characterization of chromia-forming Ni-50%Cr coatings, an alloy similar to the INCOCLAD 671 cladding, which has shown excellent performance in the Niles Plant service tests. The structure and properties of Ni-50Cr coatings are similar to other HVOF-sprayed metallic coatings: a typical lamellar microstructure is observed with essentially no porosity and little oxide. The microhardness and compressive residual stress both increase with increased spray particle velocity. Corrosion tests were performed on a variety of free-standing coatings (removed from the substrate, wrought Fe3Al alloy, and Grade 91 steel in a simulated coal combustion gas (N2-10%CO-5%CO2-2%H2O-0.12%H2S) and gas-slag environments (same gas, with iron sulfide powder in contact with the coating surface). The coatings tested included Fe3Al, FeAl, and Ni-50Cr alloys sprayed at different velocities. In these tests the iron aluminides in wrought and coating form showed the best performance, with Ni-50Cr coatings slightly worse; the Grade 91 steel was severely attacked.

  7. Synthesis, Characterization, and Catalytic Activity of Sulfided Silico-Alumino-Titanate (Si-Al-Ti) Mixed Oxides Xerogels Supported Ni-Mo Catalyst

    SciTech Connect

    Al-Adwani, H.A.; Anthony, R.G.; Gardner, T.J.; Thammachote, N.

    1999-02-24

    Layered semicrystalline silico-alumino-titanate (Si-Al-Ti) mixed oxides were synthesized by a modified sol-gel method with hydrothermal synthesis temperatures less than 200 C and autogenic pressure. The solid products are semicrystalline materials with a surface area of 136-367 m{sup 2}/g and a monomodal pore size distribution with an average pore diameter of 3.6-4.7 nrn. The catalytic activity for pyrene hydrogenation in a batch reactor at 300 C and 500 psig was determined for sulfided Ni-Mo supported on the Si-Al-Ti mixed oxide. The activity was a function of the support composition the heat treatment before and after loading the active metals, the addition of organic templates, and different methods of metal loading. The most active sulfided Ni-Mo/Si-Al-Ti catalyst has an activity in the same range as the commercial catalyst, Shell 324, but the metal loading is 37% less than the commercial catalyst.

  8. DIET processes on ruthenium surfaces related to extreme ultraviolet lithography (EUVL)

    NASA Astrophysics Data System (ADS)

    Yakshinskiy, B. V.; Wasielewski, R.; Loginova, E.; Hedhili, M. N.; Madey , T. E.

    2008-10-01

    The aim of this work is to provide insights into desorption induced by electronic transitions (DIET) processes that affect the reflectivity of ruthenium-capped Mo/Si multilayer mirrors working under EUVL (extreme ultraviolet lithography) operating conditions [high vacuum, and 13.5 nm (92 eV) photons]. Critical issues are associated with possible oxidation of the 2 nm thick Ru capping layer due to the inevitable background pressure of H 2O, and carbon build up due to background hydrocarbons. In the present work, we discuss aspects of the radiation-induced surface chemistry of Ru irradiated by 100 eV electrons and 92 eV photons. The cross section for electron-stimulated desorption of oxygen from O-covered Ru is ˜6 × 10 -19 cm 2. Carbon accumulation several nm thick occurs on the Ru surface during electron irradiation in methyl methacrylate (MMA) vapor, a model background impurity hydrocarbon. Radiation damage by low-energy secondary electrons is believed to dominate over direct photoexcitation of adsorbates under EUVL conditions. The secondary electron yield from Ru varies strongly with photon energy, and is ˜0.02 electrons/photon at 92 eV.

  9. Electrophoretic forming of functionally-graded materials

    SciTech Connect

    Sarkar, P.; Datta, S.; Nicholson, P.S.

    1997-12-31

    Electrophoretic deposition (EPD) is a colloidal forming process where electrically charged particles are deposited onto an oppositely-charged electrode from an electrostatically stabilized suspension by the application of a dc electric field. It is a cheap and facile technique to fabricate complicated ceramic shapes. EPD is very effective method to synthesize ceramic/ceramic and metal/ceramic composites, eg.; dispersed, laminar, fibre reinforced, and functionally graded materials (FGM) etc. By EPD it is possible to synthesize step FGMs and continuous profile FGMs. The compositional profile of the FGM can be controlled by deposition current density, second component flow rate, suspension concentration etc. Step and continuous profile Al{sub 2}O{sub 3}/YSZ and continuous profile Al{sub 2}O{sub 3}/MoSi{sub 2}, Al{sub 2}O{sub 3}/Ni and YSZ/Ni fabrication is reported herein. The microstructures of the FGMs produced were characterized by optical/electron microscopy and micro-indentation was used to quantify the Vicker`s hardness and fracture toughness variation across The FGM sections.

  10. Structure determination and stability for Pa-Si, Np-Si and U-X-Si (X = Mo, Th, Np) phases from first-principles

    NASA Astrophysics Data System (ADS)

    Noordhoek, Mark J.; Andersson, David; Besmann, Theodore M.

    2016-10-01

    Density functional theory (DFT) calculations are performed for Pa-Si, Np-Si and uranium-based ternary silicide phases. Structure prediction calculations are used to search for competing phases in these systems. Results using the generalized gradient approximation (GGA), on-site Coulomb correction (GGA + U) and van der Waals interactions are presented. All Pa-Si compounds reported here are structurally analogous to those found in other actinide silicide systems. The electronic structure of Pa3Si2 shows the f-orbital electrons are largely unoccupied, which is in contrast to calculations for Np3Si2. For the Np-Si system, predicted stable structures using GGA differ from the experimentally observed structures, which, however, are energetically preferred in results using the GGA + U method. Structure searches for U2MoSi, U2ThSi2 and UNpSi reveal dynamically stable ternary compounds. The phonon dispersion curves, elastic constants and electronic density of states for the various phases are compared to those from previous DFT calculations for U-Si phases.

  11. EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

    NASA Astrophysics Data System (ADS)

    Fujino, Takahiro; Tanaka, Yusuke; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo; Kinoshita, Hiroo

    2015-07-01

    In extreme ultraviolet (EUV) lithography, the three-dimensional (3D) structure of the EUV mask, which has an absorber layer and a Mo/Si multilayer on a glass substrate, strongly affects the EUV phase. EUV actinic metrology is required to evaluate the feature of defect printability and the critical dimension (CD) value. The 3D structure modulates the EUV phase, causing the pattern position and focus shift. A microscope that observes in phase contrast necessary. We have developed a coherent EUV scatterometry microscope (CSM) for observing EUV patterns with quantitative phase contrast. The exposure light is coherent EUV light. For the industrial use, we have developed a laboratory coherent source of high-harmonic-generation (HHG) EUV light. High harmonics is pumped by a scale of a Ti:Sapphire laser. In the previous study, a very long exposure time of 1000 s was necessary to detect We upgraded the relay optics. The detection performance of an absorber defect using the new relay optics is We observed the line-end oversize defect and the oversize defect in the 112 nm hole pattern and 180 nm hole pattern. The upgraded system has a detection size limit of a line-end 24-nm-oversize defect with 10 s exposure time, which is 2,688 nm2 (52 × 52 nm2) absorber defect. This result shows high performance capability of HHG-CSM for detecting small defect.

  12. Re Effects on Phase Stability and Mechanical Properties of MoSS+Mo3Si+Mo5SiB2 alloys

    SciTech Connect

    Yang, Ying; Bei, Hongbin; George, Easo P; Tiley, Jaimie

    2013-01-01

    Because of their high melting points and good oxidation resistance Mo-Si-B alloys are of interest as potential ultrahigh-temperature structural materials. But their major drawbacks are poor ductility and fracture toughness at room temperature. Since alloying with Re has been suggested as a possible solution, we investigate here the effects of Re additions on the microstructure and mechanical properties of a ternary alloy with the composition Mo-12.5Si-8.5B (at.%). This alloy has a three-phase microstructure consisting of Mo solid-solution (MoSS), Mo3Si, and Mo5SiB2 and our results show that up to 8.4 at.% Re can be added to it without changing its microstructure or forming any brittle phase at 1600 C. Three-point bend tests using chevron-notched specimens showed that Re did not improve fracture toughness of the three-phase alloy. Nanoindentation performed on the MoSS phase in the three-phase alloy showed that Re increases Young s modulus, but does not lower hardness as in some Mo solid solution alloys. Based on our thermodynamic calculations and microstructural analyses, the lack of a Re softening effect is attributed to the increased Si levels in the Re-containing MoSS phase since Si is known to increase its hardness. This lack of softening is possibly why there is no Re-induced improvement in fracture toughness.

  13. Lasers, extreme UV and soft X-ray

    DOE PAGES

    Nilsen, Joseph

    2015-09-20

    Three decades ago, large ICF lasers that occupied entire buildings were used as the energy sources to drive the first X-ray lasers. Today X-ray lasers are tabletop, spatially coherent, high-repetition rate lasers that enable many of the standard optical techniques such as interferometry to be extended to the soft X-ray regime between wavelengths of 10 and 50 nm. Over the last decade X-ray laser performance has been improved by the use of the grazing incidence geometry, diode-pumped solid-state lasers, and seeding techniques. The dominant X-ray laser schemes are the monopole collisional excitation lasers either driven by chirped pulse amplification (CPA)more » laser systems or capillary discharge. The CPA systems drive lasing in neon-like or nickel-like ions, typically in the 10 – 30 nm range, while the capillary system works best for neon-like argon at 46.9 nm. Most researchers use nickel-like ion lasers near 14 nm because they are well matched to the Mo:Si multilayer mirrors that have peak reflectivity near 13 nm and are used in many applications. As a result, the last decade has seen the birth of the X-ray free electron laser (XFEL) that can reach wavelengths down to 0.15 nm and the inner-shell Ne laser at 1.46 nm.« less

  14. Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source

    SciTech Connect

    Barkusky, Frank; Peth, Christian; Bayer, Armin; Mann, Klaus

    2007-06-15

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-based EUV plasma source (pulse energy 3 mJ at {lambda}=13.5 nm, plasma diameter {approx}300 {mu}m). By 10x demagnified imaging of the plasma a pulse energy density of {approx}75 mJ/cm{sup 2} at a pulse length of 6 ns can be achieved in the image plane of the objective. As demonstrated for poly(methyl methacrylate) (PMMA), photoetching of polymer surfaces is possible at this EUV fluence level. This paper presents first results, including a systematic determination of PMMA etching rates under EUV irradiation. Furthermore, the contribution of out-of-band radiation to the surface etching of PMMA was investigated by conducting a diffraction experiment for spectral discrimination from higher wavelength radiation. Imaging of a pinhole positioned behind the plasma accomplished the generation of an EUV spot of 1 {mu}m diameter, which was employed for direct writing of surface structures in PMMA.

  15. Angle-resolved photoemission spectroscopy with a femtosecond high harmonic light source using a two-dimensional imaging electron analyzer

    NASA Astrophysics Data System (ADS)

    Mathias, S.; Miaja-Avila, L.; Murnane, M. M.; Kapteyn, H.; Aeschlimann, M.; Bauer, M.

    2007-08-01

    An experimental setup for time- and angle-resolved photoemission spectroscopy using a femtosecond 1kHz high harmonic light source and a two-dimensional electron analyzer for parallel energy and momentum detection is presented. A selection of the 27th harmonic (41.85eV) from the harmonic spectrum of the light source is achieved with a multilayer Mo /Si double mirror monochromator. The extinction efficiency of the monochromator in selecting this harmonic is shown to be better than 7:1, while the transmitted bandwidth of the selected harmonic is capable of supporting temporal pulse widths as short as 3fs. The recorded E(k ) photoelectron spectrum from a Cu(111) surface demonstrates an angular resolution of better than 0.6° (=0.03Å-1 at Ekin ,e=36eV). Used in a pump-probe configuration, the described experimental setup represents a powerful experimental tool for studying the femtosecond dynamics of ultrafast surface processes in real time.

  16. Salivary contamination and post-cured resin/resin lute bond.

    PubMed

    Stokes, A N; Pereira, B P

    1994-01-01

    A previous study has shown that sandblasting and silane priming a post-cured inlay resin gave a secure bond to dual-cure luting resin. To determine the influence of salivary contamination 4 additional groups of 15 post-cured resin discs were mounted in acrylic cylinders, their faces sandblasted with 50 microns alumina and silane primed. Surface treatments with saliva (sa), air/water spray (a/w), phosphoric acid gel (pa), and silane (si) followed in the order listed: A) control, no further treatment; B) sa, a/w; C) sa, a/w, si; D) sa, a/w, pa a/w; E) sa, a/w, pa, a/w, si. A 3.9 mm diameter column of dual-cure resin lute was then bonded to the dry stored in water surfaces. Specimens were stored in water for 2 weeks after which the dual-cure resin columns were sheared off the post-cured resin discs. Shear bond strengths were A) 19.2 +/- 3.7, B) 17.4 +/- 3.9, C) 16.7 +/- 3.1, D) 15.6 +/- 3.5, E) 15.4 +/- 2.3 MPa. One-way ANOVA and Duncan's Multiple Range Procedure showed groups D and E to be significantly lower than the uncontaminated control group A (p < 0.05). There were 2 adhesive failures in group B and all others were cohesive within the post-cured resin discs. This implies that air/water alone after salivary contamination is an unreliable cleansing method. The low shear bond values for Groups D and E may have been related to inadequate clearance of the phosphoric acid gel. It was concluded that salivary contamination adversely affected the quality of the bonds studied and decontamination using phosphoric acid gel resulted in significantly reduced shear bond strengths.

  17. Influence of heat treatments on microstructure, mechanical properties, and corrosion resistance of weld alloy 625

    NASA Astrophysics Data System (ADS)

    Cortial, F.; Corrieu, J. M.; Vernot-Loier, C.

    1995-05-01

    The effects of heat treatments of the industrial type (eight-hour hold times at temperatures between 600 °C and 1000 °C) on the structural, mechanical, and corrosion resistance characteristics of weld alloy 625 have been studied. During the heat treatment, the mean concentration ratios of Nb, Mo, Si, Cr, Ni, and Fe elements between the interdendritic spaces and dendrite cores show little evolution up to 850 °C. Beyond that temperature, this ratio approximates 1, and the composition heterogeneity has practically disappeared at 1000 °C. An eight-hour heat treatment at temperatures between 650 °C and 750 °C results in increased mechanical strength values and reduced ductility and impact strength linked to the precipitation of body-centered tetragonal metastable intermetallic γ″ Ni3Nb phase in the interdendritic spaces. An eight-hour treatment in the temperature range between 750 °C and 950 °C has catastrophic effects on all mechanical characteristics in relation with the precipitation, in the interdendritic spaces, of the stable orthorhombic intermetallic δ Ni3(Nb, Mo, Cr, Fe, Ti) phase. At 1000 °C, the ductility and impact strength are restored. However, the higher the heat treatment temperature, the weaker the mechanical strength. Heat treatments have no effect on the pitting resistance of weld alloy 625 in sea water. The comparison of the results of this study on weld alloy 625 with those previously obtained on forged metal 625 shows that heat treatments below 650 °C and above 1000 °C are the sole treatments to avoid embrittlement and impairment of the corrosion resistance characteristics of alloy 625.

  18. Comparative Evaluation of Mask Production CAR Development Process with Stepwise Defect Inspection

    NASA Astrophysics Data System (ADS)

    Jeong, Woo-Gun; Lee, Jung-Kwan; Park, Dong-Il; Park, Eu-Sang; Lee, Jong-Hwa; Seo, Sun-Kyu; Lee, Dong-Heok; Kim, Jin-Min; Choi, Sang-Soo; Jeong, Soo-Hong

    2002-12-01

    Chemically amplified resist (CAR) provides superior lithographic performance compared to traditional e-beam resists in production maskmaking. Parameters benefiting the most are contrast, resolution, and sensitivity. In spite of CAR's advantages, defect control and tighter 50KeV e-beam CAR process restrictions are significantly more critical thanks to smaller geometries, tighter CD specifications, and optical proximity correction (OPC) for 90nm node mask technology. Among defect root causes, resist development is considered to be the one of the most important steps because post-development residue can generate printable defects on finished masks. We investigated the CAR development process across different resist development methods, such as binary and fan-type nozzle spin spray, and puddle development. Several high density binary and embedded-attenuated phase shift masks (EAPSMs) with 70% clear area in the main pattern field were evaluated in an effort to identify and contain post-develop defects in a typical mask production flow. Development step process residue was examined at the after-develop inspection (ADI) step and scanning electron microscopy (SEM) was used for individual defect review. The KLA-Tencor SLF77 TeraStar inspection tool was used to inspect patterns after the development, Cr/MoSiON layer dry etch, and clean steps. The effectiveness of the various CAR development methods has been also studied following development, dry etch, and cleaning inspection by using identical binary and EAPSM masks from production. The mechanism and defect source during the stepwise process and inspections were scrutinized and discussed. Experimental results showed that stepwise process inspection was effective in identifying defects and their sources to prevent defects, and in optimizing each process step. It was found that CAR development and dry etch processes are the most important process steps to control defects in CAR-based mask production. Suggested optimized

  19. Precise and high-throughput femtopulse laser mask repair of large defects

    NASA Astrophysics Data System (ADS)

    White, Roy; LeClaire, Jeff; Robinson, Tod; Dinsdale, Andrew; Bozak, Ron; Lee, David A.

    2006-10-01

    As mask complexity has increased and design rules continued to shrink, the manufacturing cost per mask has steadily increased as well. Studies also show that defects are the number one issue for mask yield. Smaller defects are typically addressed through process development, or through photomask repair. The occurrence of large defects often may only be further reduced through use of expensive clean room improvements, like SMIF handling systems. The impact of each large defect therefore increases while the feasibility in their repair decreases as they can span a large number of adjoining densely packed patterns. The presence of sub-resolution features such as scatter bars and the increasing use of embedded phase-shifting masks also complicates the timely repair of such defects. Existing mask repair techniques such as nanomachining, electron beam, or focused ion beam are challenged to produce high yield repairs on such large defects within a reasonable timeframe. Often very complex repairs may in fact take longer than a rewrite of the mask! Deep UV (DUV) femtosecond pulse laser mask repair provides a unique solution to this defect repair need. Methods and results are discussed for the process optimization for the removal of large (5μm) area repair on both Cr and MoSi absorber films on quartz. Additionally, high repair throughput results are shown for unknown contamination removal, and reproduction of >=1 μm complex unconnected patterns in a single repair run lasting a matter of minutes. Closed-loop CD feedback in-situ with the iterative repair process for such structures can readily result in an edge placement control within +/-15 nm. Prior iterative CD closed-loop repairs on specific structures have reliably yielded results within +/-10 nm, as confirmed by AIMS CD error, even after aggressive mask wet clean. The nanometer scale dimensional resolution and repeatability of such repairs is shown with the use of sub-pixel resolution automated pattern reconstruction

  20. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination.

  1. Investigation of Thickness Dependence of Metal Layer in Al/Mo/4H-SiC Schottky Barrier Diodes.

    PubMed

    Lee, Seula; Lee, Jinseon; Kang, Tai-Young; Kyoung, Sinsu; Jung, Eun Sik; Kim, Kyung Hwan

    2015-11-01

    In this paper, we present the preparation and characterization of Schottky barrier diodes based on silicon carbide with various Schottky metal layer thickness values. In this structure, molybdenum and aluminum were employed as the Schottky barrier metal and top electrode, respectively. Schottky metal layers were deposited with thicknesses ranging from 1000 to 3000 Å, and top electrodes were deposited with thickness as much as 3000 Å. The deposition of both metal layers was performed using the facing target sputtering (FTS) method, and the fabricated samples were annealed with the tubular furnace at 300 degrees C under argon ambient for 10 min. The Schottky barrier height, series resistance, and ideality factor was calculated from the forward I-V characteristic curve using the methods proposed by Cheung and Cheung, and by Norde. For as-deposited Schottky diodes, we observed an increase of the threshold voltage (V(T)) as the thickness of the Schottky metal layer increased. After the annealing, the Schottky barrier heights (SBHs) of the diodes, including Schottky metal layers of over 2000 Å, increased. In the case of the Schottky metal layer deposited to 1000 Å, the barrier heights decreased due to the annealing process. This may have been caused by the interfacial penetration phenomenon through the Schottky metal layer. For variations of V(T), the SBH changed with a similar tendency. The ideality factor and series resistance showed no significant changes before or after annealing. This indicates that this annealing condition is appropriate for Mo SiC structures. Our results confirm that it is possible to control V(T) by adjusting the thickness of the Schottky metal layer.

  2. Characteristics and issues of haze management in a wafer fabrication environment

    NASA Astrophysics Data System (ADS)

    Woo, Sung Ha; Hwang, Dae Ho; Jeong, Goo Min; Lee, Young Mo; Kim, Sang Pyo; Yim, Dong Gyu

    2014-10-01

    The haze nucleation and growth phenomenon on critical photomask surfaces has periodically gained attention as it has significantly impacted wafer printability for different technology nodes over the years. A number of process solutions have been promoted in the semiconductor industry which has been shown to suppress or minimize the propensity for haze formation, but none of these technologies can stop every instance of haze. Fortunately, a novel technology which uses a dry (no chemical effluents) removal system, laser-based, through pellicle process has been reported recently. The technology presented here avoids many of the shortcomings of the wet clean process mentioned previously. The dry clean process extends the life of the photomask; maintains more consistent CD's, phase, and transmission; avoids adjustment to the exposure dose to account for photomask changes, reduces the number of required inspections and otherwise improves the efficiency and predictability of the lithography cell. We report on the performance of photomask based on a design developed to study the impact of metrology variations on dry clean process. In a first step we focus on basic characteristics: CD variation, phase, Cr/MoSi transmission, pellicle transmission, registration variations. In a second step, we evaluate haze removal and prevention performance and wafer photo margin. Haze removal is studied on the masks for several haze types and various exposure conditions. The results of this study show that some of metrology variation are likely to be a problem at high technology node, and haze removal performance is determined whether the component of haze is remained or not after treatment.

  3. Sensitivity analysis for OMOG and EUV photomasks characterized by UV-NIR spectroscopic ellipsometry

    NASA Astrophysics Data System (ADS)

    Heinrich, A.; Dirnstorfer, I.; Bischoff, J.; Meiner, K.; Richter, U.; Mikolajick, T.

    2013-09-01

    We investigated the potentials, applicability and advantages of spectroscopic ellipsometry (SE) for the characterization of high-end photomasks. The SE measurements were done in the ultraviolet-near infrared (UVNIR) wavelength range from 300 nm to 980 nm, at angle of incidences (AOI) between 10 and 70° and with a microspot size of 45 x 10 μm2 (AOI=70°). The measured Ψ and 𝛥 spectra were modeled using the rigorous coupled wave analysis (RCWA) to determine the structural parameters of a periodic array, i.e. the pitch and critical dimension (CD). Two different types of industrial photomasks consisting of line/space structures were evaluated, the reflecting extreme ultraviolet (EUV) and the transmitting opaque MoSi on glass (OMOG) mask. The Ψ and 𝛥 spectra of both masks show characteristic differences, which were related to the Rayleigh singularities and the missing transmission diffraction in the EUV mask. In the second part of the paper, a simulation based sensitivity analysis of the Fourier coefficients α and β is presented, which is used to define the required measurement precision to detect a CD deviation of 1%. This study was done for both mask types to investigate the influence of the stack transmission. It was found that sensitivities to CD variations are comparable for OMOG and EUV masks. For both masks, the highest sensitivities appear close to the Rayleigh singularities and significantly increase at very low AOI. To detect a 1% CD deviation for pitches below 150 nm a measurement precision in the order of 0.01 is required. This measurement precision can be realized with advanced optical hardware. It is concluded that UV-NIR ellipsometry is qualified to characterize photomasks down to the 13 nm technology node in 2020.

  4. Corrosion of 316 stainless steel in high temperature molten Li2BeF4 (FLiBe) salt

    NASA Astrophysics Data System (ADS)

    Zheng, Guiqiu; Kelleher, Brian; Cao, Guoping; Anderson, Mark; Allen, Todd; Sridharan, Kumar

    2015-06-01

    In support of structural material development for the fluoride-salt-cooled high-temperature reactor (FHR), corrosion tests of 316 stainless steel were performed in the potential primary coolant, molten Li2BeF4 (FLiBe) at 700 °C for an exposure duration up to 3000 h. Tests were performed in both 316 stainless steel and graphite capsules. Corrosion in both capsule materials occurred by the dissolution of chromium from the stainless steel into the salt which led to the depletion of chromium predominantly along the grain boundaries of the test samples. The samples tested in graphite capsules showed a factor of two greater depth of corrosion attack as measured in terms of chromium depletion, compared to those tested in 316 stainless steel capsules. The samples tested in graphite capsules showed the formation of Cr7C3 particulate phases throughout the depth of the corrosion layer. Samples tested in both types of capsule materials showed the formation of MoSi2 phase due to increased activity of Mo and Si as a result of Cr depletion, and furthermore corrosion promoted the formation of a α-ferrite phase in the near-surface regions of the 316 stainless steel. Based on the corrosion tests, the corrosion attack depth in FLiBe salt was predicted as 17.1 μm/year and 31.2 μm/year for 316 stainless steel tested in 316 stainless steel and in graphite capsules respectively. It is in an acceptable range compared to the Hastelloy-N corrosion in the Molten Salt Reactor Experiment (MSRE) fuel salt.

  5. Evaluating Impacts of CO2 and CH4 Gas Intrusion into an Unconsolidated Aquifer: Fate of As and Cd

    SciTech Connect

    Lawter, Amanda R.; Qafoku, Nikolla; Shao, Hongbo; Bacon, Diana H.; Brown, Christopher F.

    2015-07-10

    Abstract The sequestration of carbon dioxide (CO2) in deep underground reservoirs has been identified as an important strategy to decrease atmospheric CO2 levels and mitigate global warming, but potential risks on overlying aquifers currently lack a complete evaluation. In addition to CO2, other gases such as methane (CH4) may be present in storage reservoirs. This paper explores for the first time the combined effect of leaking CO2 and CH4 gasses on the fate of major, minor and trace elements in an aquifer overlying a potential sequestration site. Emphasis is placed on the fate of arsenic (As) and cadmium (Cd) released from the sediments or present as soluble constituents in the leaking brine. Results from macroscopic batch and column experiments show that the presence of CH4 (at a concentration of 1 % in the mixture CO2/CH4) does not have a significant effect on solution pH or the concentrations of most major elements (such as Ca, Ba, and Mg). However, the concentrations of Mn, Mo, Si and Na are inconsistently affected by the presence of CH4 (i.e., in at least one sediment tested in this study). Cd is not released from the sediments and spiked Cd is mostly removed from the aqueous phase most likely via adsorption. The fate of sediment associated As [mainly sorbed arsenite or As(III) in minerals] and spiked As [i.e., As5+] is complex. Possible mechanisms that control the As behavior in this system are discussed in this paper. Results are significant for CO2 sequestration risk evaluation and site selection and demonstrate the importance of evaluating reservoir brine and gas stream composition during site selection to ensure the safest site is being chosen.

  6. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.

    PubMed

    Bogachev, S A; Chkhalo, N I; Kuzin, S V; Pariev, D E; Polkovnikov, V N; Salashchenko, N N; Shestov, S V; Zuev, S Y

    2016-03-20

    We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3  nm, λ=17-21  nm, λ=28-33  nm, and λ=58.4  nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range λ=13  nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range λ=17-21  nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range λ=30  nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range λ=58  nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. PMID:27140543

  7. High-temperature corrosion of UNS N10003 in molten Li2BeF4 (FLiBe) salt

    SciTech Connect

    Zheng, Guiqiu; Kelleher, Brian; He, Lingfeng; Cao, Guoping; Anderson, Mark; Allen, Todd; Sridharan, Kumar

    2015-07-30

    Here, corrosion testing of Hastelloy N in molten fluoride salt was performed in purified molten 27LiF-BeF2 (66-34mol%) (FLiBe) salt at 700°C for 1000 hours, in pure nickel and graphite capsules. In the nickel capsule tests, the near-surface region of the alloy exhibited an about 200 nm porous structure, an approximately 3.5 μm chromium depleted region, and MoSi2 precipitates. In tests performed in graphite capsules, the alloy samples gained weight due to the formation of a variety of Cr3C2, Cr7C3, Mo2C and Cr23C6, carbide phases on the surface and in the subsurface regions of the alloy. A Cr depleted region was observed in the near-surface region where Mo thermally diffused toward either surface or grain boundary, which induced approximately 1.4 μm Ni3Fe alloy layer in this region. The carbide containing layer extended to about 7 μm underneath the Ni3Fe layer. The presence of graphite dramatically changes the mechanisms of corrosion attack in Hastelloy N in molten FLiBe salt. Evaluated by in terms of the depth of attack, graphite clearly accelerates corrosion, but the results appear to indicate that the formation of Cr23C6 phase might stabilize the Cr and mitigate its dissolution in molten FLiBe salt.

  8. High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments

    SciTech Connect

    Voronov, Dmitriy; Ahn, Minseung; Anderson, Erik; Cambie, Rossana; Chang, Chih-Hao; Goray, Leonid; Gullikson, Eric; Heilmann, Ralf; Salmassi, Farhad; Schattenburg, Mark; Warwick, Tony; Yashchuk, Valeriy; Padmore, Howard

    2011-07-26

    Multilayer coated blazed gratings with high groove density are the best candidates for use in high resolution EUV and soft x-ray spectroscopy. Theoretical analysis shows that such a grating can be potentially optimized for high dispersion and spectral resolution in a desired high diffraction order without significant loss of diffraction efficiency. In order to realize this potential, the grating fabrication process should provide a perfect triangular groove profile and an extremely smooth surface of the blazed facets. Here we report on recent progress achieved at the Advanced Light Source (ALS) in fabrication of high quality multilayer coated blazed gratings. The blazed gratings were fabricated using scanning beam interference lithography followed by wet anisotropic etching of silicon. A 200 nm period grating coated with a Mo/Si multilayer composed with 30 bi-layers demonstrated an absolute efficiency of 37.6percent in the 3rd diffraction order at 13.6 nm wavelength. The groove profile of the grating was thoroughly characterized with atomic force microscopy before and after the multilayer deposition. The obtained metrology data were used for simulation of the grating efficiency with the vector electromagnetic PCGrate-6.1 code. The simulations showed that smoothing of the grating profile during the multilayer deposition is the main reason for efficiency losses compared to the theoretical maximum. Investigation of the grating with cross-sectional transmission electron microscopy revealed a complex evolution of the groove profile in the course of the multilayer deposition. Impact of the shadowing and smoothing processes on growth of the multilayer on the surface of the sawtooth substrate is discussed.

  9. EUVL Mask Blank Repair

    SciTech Connect

    Barty, A; Mirkarimi, P; Stearns, D G; Sweeney, D; Chapman, H N; Clift, M; Hector, S; Yi, M

    2002-05-22

    EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Small defects in this thin film coating can significantly alter the reflected field and introduce defects in the printed image. Ideally one would want to produce defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to effectively repair multilayer defects, and to this effect they present two complementary defect repair strategies for use on multilayer-coated EUVL mask blanks. A defect is any area on the mask which causes unwanted variations in EUV dose in the aerial image obtained in a printing tool, and defect repair is correspondingly defined as any strategy that renders a defect unprintable during exposure. The term defect mitigation can be adopted to describe any strategy which renders a critical defect non-critical when printed, and in this regard a non-critical defect is one that does not adversely affect device function. Defects in the patterned absorber layer consist of regions where metal, typically chrome, is unintentionally added or removed from the pattern leading to errors in the reflected field. There currently exists a mature technology based on ion beam milling and ion beam assisted deposition for repairing defects in the absorber layer of transmission lithography masks, and it is reasonable to expect that this technology will be extended to the repair of absorber defects in EUVL masks. However, techniques designed for the repair of absorber layers can not be directly applied to the repair of defects in the mask blank, and in particular the multilayer film. In this paper they present for the first time a new technique for the repair of amplitude defects as well as recent results on the repair of phase defects.

  10. A new total reflection X-ray fluorescence vacuum chamber with sample changer analysis using a silicon drift detector for chemical analysis*1

    NASA Astrophysics Data System (ADS)

    Streli, C.; Wobrauschek, P.; Pepponi, G.; Zoeger, N.

    2004-08-01

    There are several TXRF spectrometers commercially available for chemical analysis as well as for wafer surface analysis, but there is up to now no spectrometer for chemical analysis available that allows to measure samples under vacuum conditions. Simply a rough vacuum of 10 -2 mbar for the sample environment reduces the background due to scattering from air, thus to improve the detection limits. The absorption of low energy fluorescence radiation from low Z elements is reduced and therefore extends the elemental range to be measured down to Na. Finally evacuation of the chamber removes the Ar K-lines from the spectrum. The new vacuum chamber for TXRF named WOBISTRAX is equipped with a 12-position sample changer, a 10-mm 2 silicon drift detector (SDD) with an 8-μm Be entrance window and electrical cooling by Peltier effect, so no LN 2 is required. The chamber was designed to be attached to a diffraction tube housing. WOBISTRAX can be operated with a 3 kW long fine focus Mo-X-ray tube and uses a Mo/Si multilayer for monochromatization. The modified software is performing the motion control between sample changer and MCA features. The performance is expressed in terms of detection limits which are 700 fg Rb for Mo Kα excitation with 50 kV, 40 mA excitation conditions, 1000 s livetime. Using a Cr-X-ray tube for excitation of Al the achieved detection limits are 52 pg. So it could be shown that with the same measuring chamber and using an SDD with 8 μm Be window and a Cr-tube for excitation, low Z elements can be also measured with good detection limits.

  11. Synthesis and Design of Silicide Intermetallic Materials

    SciTech Connect

    Petrovic, J.J.; Castro, R.G.; Vaidya, R.U.; Park, Y.

    1999-05-14

    The overall objective of this program is to develop structural silicide-based materials with optimum combinations of elevated temperature strength/creep resistance, low temperature fracture toughness, and high temperature oxidation and corrosion resistance for applications of importance to the US processing industry. A further objective is to develop silicide-based prototype industrial components. The ultimate aim of the program is to work with industry to transfer the structural silicide materials technology to the private sector in order to promote international competitiveness in the area of advanced high temperature materials and important applications in major energy-intensive US processing industries. The program presently has a number of industrial connections, including a CRADA with Johns Manville Corporation targeted at the area of MoSi{sub 2}-based high temperature materials for fiberglass melting and processing applications. The authors are also developing an interaction with the Institute of Gas Technology (IGT) to develop silicides for high temperature radiant gas burner applications, for the glass and other industries. With the Exotherm Corporation, they are developing advanced silicide powders for the fabrication of silicide materials with tailored and improved properties for industrial applications. In October 1998, the authors initiated a new activity funded by DOE/OIT on ``Molybdenum Disilicide Composites for Glass Processing Sensors''. With Accutru International Corporation, they are developing silicide-based protective sheaths for self-verifying temperature sensors which may be used in glass furnaces and other industrial applications. With Combustion Technology Inc., they are developing silicide-based periscope sight tubes for the direct observation of glass melts.

  12. Large-area soft x-ray projection lithography using multilayer mirrors structured by RIE

    NASA Astrophysics Data System (ADS)

    Rahn, Steffen; Kloidt, Andreas; Kleineberg, Ulf; Schmiedeskamp, Bernt; Kadel, Klaus; Schomburg, Werner K.; Hormes, F. J.; Heinzmann, Ulrich

    1993-01-01

    SXPL (soft X-ray projection lithography) is one of the most promising applications of X-ray reflecting optics using multilayer mirrors. Within our collaboration, such multilayer mirrors were fabricated, characterized, laterally structured and then used as reflection masks in a projecting lithography procedure. Mo/Si-multilayer mirrors were produced by electron beam evaporation in UHV under thermal treatment with an in-situ X-ray controlled thickness in the region of 2d equals 14 nm. The reflectivities measured at normal incidence reached up to 54%. Various surface analysis techniques have been applied in order to characterize and optimize the X-ray mirrors. The multilayers were patterned by reactive ion etching (RIE) with CF(subscript 4), using a photoresist as the etch mask, thus producing X-ray reflection masks. The masks were tested in the synchrotron radiation laboratory of the electron accelerator ELSA at the Physikalisches Institut of Bonn University. A double crystal X-ray monochromator was modified so as to allow about 0.5 cm(superscript 2) of the reflection mask to be illuminated by white synchrotron radiation. The reflected patterns were projected (with an energy of 100 eV) onto the resist (Hoechst AZ PF 514), which was mounted at an average distance of about 7 mm. In the first test-experiments, structure sizes down to 8 micrometers were nicely reproduced over the whole of the exposed area. Smaller structures were distorted by Fresnel-diffraction. The theoretically calculated diffraction images agree very well with the observed images.

  13. Characterization of elemental and polycyclic aromatic hydrocarbon compositions of urban air in Brisbane

    NASA Astrophysics Data System (ADS)

    Lim, McKenzie C. H.; Ayoko, Godwin A.; Morawska, Lidia

    Characterization of the elemental and polycyclic aromatic hydrocarbons (PAHs) compositions of urban air was undertaken at three major sites in Brisbane, Australia. 17 elements and 16 US EPA priority PAHs were quantified at the sites. The most commonly detected elements in the TSP and PM 2.5 fractions were Al, Cd, Co, Cr, Cu, Fe, Mn, Mo, Si, Sn, Sr and Zn. Compared to the two other sites, PM 2.5 was found to contain higher concentrations of Zr, Mo, V, Al, Mn and Sr at the Queensland University of Technology (QUT) site. In contrast, the Woolloongabba sampling site, which was highly influenced by the vehicular emission and local industrial activities, has higher concentrations of Co, Sn, Cu, Zn and Mg while ANZ site has significantly lower concentration levels of most elements than the other sites; possibly due to the shielding effect of the nearby bush and forest. NAP, PHE, ANT, FLT, PYR and CRY were the most widespread PAHs found in all sites. But only QUT and Woolloongabba bus platform sites had detectable levels of the most carcinogenic US EPA PAH, BAP. The multi-criteria decision making procedures, Preference Ranking Organisation Method for Enrichment Evaluation (PROMETHEE) and Geometrical Analysis for Interactive Aid (GAIA) were used to rank the air samples and to identify the sources of the pollutants. Thus Woolloongabba bus platform was ranked as the most polluted site on the basis of the elemental and PAH compositions of its air samples while Woolloongabba bus platform and QUT sites were ranked as the worst polluted sites in terms of PAHs and PM 2.5 elemental contents, respectively.

  14. Investigation of Thickness Dependence of Metal Layer in Al/Mo/4H-SiC Schottky Barrier Diodes.

    PubMed

    Lee, Seula; Lee, Jinseon; Kang, Tai-Young; Kyoung, Sinsu; Jung, Eun Sik; Kim, Kyung Hwan

    2015-11-01

    In this paper, we present the preparation and characterization of Schottky barrier diodes based on silicon carbide with various Schottky metal layer thickness values. In this structure, molybdenum and aluminum were employed as the Schottky barrier metal and top electrode, respectively. Schottky metal layers were deposited with thicknesses ranging from 1000 to 3000 Å, and top electrodes were deposited with thickness as much as 3000 Å. The deposition of both metal layers was performed using the facing target sputtering (FTS) method, and the fabricated samples were annealed with the tubular furnace at 300 degrees C under argon ambient for 10 min. The Schottky barrier height, series resistance, and ideality factor was calculated from the forward I-V characteristic curve using the methods proposed by Cheung and Cheung, and by Norde. For as-deposited Schottky diodes, we observed an increase of the threshold voltage (V(T)) as the thickness of the Schottky metal layer increased. After the annealing, the Schottky barrier heights (SBHs) of the diodes, including Schottky metal layers of over 2000 Å, increased. In the case of the Schottky metal layer deposited to 1000 Å, the barrier heights decreased due to the annealing process. This may have been caused by the interfacial penetration phenomenon through the Schottky metal layer. For variations of V(T), the SBH changed with a similar tendency. The ideality factor and series resistance showed no significant changes before or after annealing. This indicates that this annealing condition is appropriate for Mo SiC structures. Our results confirm that it is possible to control V(T) by adjusting the thickness of the Schottky metal layer. PMID:26726688

  15. Changes in hydrological patterns and climate variability for the past 1000 years in the southern Gulf of California

    NASA Astrophysics Data System (ADS)

    Pérez-Cruz, Ligia; Rodríguez, Alejandro; Roy, Priyadarsi; Urrutia-Fucugauchi, Jaime

    2013-04-01

    This study aims to document changes in hydrological patterns, variations in oxygenation and bio-productivity associated with regional climate conditions (v. gr. such a precipitation, cyclonic gyre and North America Monsoon) in the southern Gulf of California. A laminated sediment box core C36 was collected in Alfonso Basin, Bay of La Paz, southern Gulf of California, at 390 m depth. Total core length is 36.5 cm. The preliminary chronology for core C36 is based on 210-Pb and AMS radiocarbon dates. Samples were dried and grounded and bulk-sediment chemistry was measured using a Thermo Scientific Niton XL3t GOLDD X-ray fluorescence (XRF) analyzer. Major and trace elements were determined. The marine standard HISS-1 was used for calibration. The following elements and ratios are considered for the analysis: Al, Ba, Ca, Fe, K, Mo, Si, Ti, V and Zr and Zr/Al and Ba/Al, which are used as proxies of terrigenous input, oxygenation and bio-productivity. A total of 122 continuous measurements along the whole core were obtained. Element chemical concentrations and their stratigraphic distribution are interpreted in terms of changes in hydrological cycle and paleoproductivity in the region. According to the radiocarbon date the core spans 909 cal yr BP (AD 1041). We also considered 210-Pb dates from a core collected nearby to the C36. Sedimentation rates estimated are 0.6 and 0.34 mm/yr. Further dating is in progress. Magnetic susceptibility logging is used as indicator of mineral magnetic concentrations associated with diagenetic processes and terrigenous input. The Al, K, Si and Ti are used as proxies of terrigenous input, Zr/Al ratio is used as proxy of aeolian input, and Ba/Al ratio is a proxy of paloeproductivity.

  16. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications

    SciTech Connect

    Soufli, R

    1997-12-01

    The response of a given material to an incident electromagnetic wave is described by the energy dependent complex index of refraction n = 1 {minus} {delta} + i{beta}. In the extreme ultraviolet (EUV)/soft x-ray spectral region, the need for accurate determination of n is driven by activity in areas such as synchrotron based research, EUV/x-ray lithography, x-ray astronomy and plasma applications. Knowledge of the refractive index is essential for the design of the optical components of instruments used in experiments and applications. Moreover, measured values of n may be used to evaluate solid state models for the optical behavior of materials. The refractive index n of Si, Mo and Be is investigated in the EUV/soft x-ray region. In the case of Si, angle dependent reflectance measurements are performed in the energy range 50--180 eV. The optical constants {delta}, {beta} are both determined by fitting to the Fresnel equations. The results of this method are compared to the values in the 1993 atomic tables. Photoabsorption measurements for the optical constants of Mo are performed on C/Mo/C foils, in the energy range 60--930 eV. Photoabsorption measurements on Be thin films supported on silicon nitride membranes are performed, and the results are applied in the determination of the absorption coefficient of Be in the energy region 111.5--250 eV. The new results for Si and Mo are applied to the calculation of normal incidence reflectivities of Mo/Si and Mo/Be multilayer mirrors. These calculations show the importance of accurate knowledge of {delta} and {beta} in the prediction and modeling of the performance of multilayer optics.

  17. Seawater recharge into oceanic crust: IODP Exp 327 Site U1363 Grizzly Bare outcrop

    NASA Astrophysics Data System (ADS)

    Wheat, C. Geoffrey; Hulme, Samuel M.; Fisher, Andrew T.; Orcutt, Beth N.; Becker, Keir

    2013-06-01

    Systematic differences in sediment thermal and pore water chemical profiles from Integrated Ocean Drilling Program Site U1363 document mixing and reaction within the basaltic crust adjacent to Grizzly Bare outcrop, a site of hydrothermal recharge into 3.6 My-old basaltic crust. A transect of seven holes was drilled ~50 m to ~750 m away from the base of the outcrop. Temperatures at the sediment-basement interface increase from ~6°C to >30°C with increasing distance from the outcrop, and heat flow is suppressed within several hundred meters from the outcrop. Calculated fluid compositions at the sediment-basement interface are generally explained by mixing between bottom seawater and altered crustal basement fluids, with a composition similar but not identical to fluids from seeps at Baby Bare outcrop, located ~45 km to the northeast. Reactions within upper basement and overlying sediment affect a variety of ions (Mn, Fe, Mo, Si, PO43-, V, and U) and δ13DIC, indicating a diagenetic influence and diffusive exchange with overlying sediment pore waters. The apparent 14C age of basal pore fluids is much older than bottom seawater. Collectively, these results are consistent with seawater recharge at Grizzly Bare outcrop; however, there are strong gradients in fluid composition within 50 m of the outcrop, providing evidence for complex flow paths and vigorous mixing of young, recently recharged seawater with much older, more reacted basement fluid. The proximity of these altered fluids to the edge of the outcrop raises the possibility for fluid seepage from the outcrop in addition to seawater recharge.

  18. Development of silicide coating over molybdenum based refractory alloy and its characterization

    NASA Astrophysics Data System (ADS)

    Chakraborty, S. P.; Banerjee, S.; Sharma, I. G.; Suri, A. K.

    2010-08-01

    Molybdenum based refractory alloys are potential candidate materials for structural applications in high temperature compact nuclear reactors and fusion reactors. However, these alloys being highly susceptible to oxidation in air or oxygen at elevated temperature, undergoes severe losses from highly volatile molybdenum trioxide species. Present investigation, therefore, examines the feasibility of development of silicide type of coating over molybdenum base TZM alloy shape (Mo > 99 wt.%) using pack cementation coating technique. TZM alloy was synthesized in this laboratory from oxide intermediates of MoO 2, TiO 2 and ZrO 2 in presence of requisite amount of carbon, by alumino-thermic reduction smelting technique. The arc melted and homogenized samples of TZM alloy substrate was then embedded in the chosen and intimately mixed pack composition consisting of inert matrix (Al 2O 3), coating powder (Si) and activator (NH 4Cl) taken in the judicious proportion. The sealed charge packs contained in an alumina crucible were heated at temperatures of 1000 °C for 8-16 h heating cycle to develop the coating. The coating phase was confirmed to be of made of MoSi 2 by XRD analysis. The morphology of the coating was studied by SEM characterization. It had revealed that the coating was diffusion bonded where Si from coating diffused inward and Mo from TZM substrate diffused outward to form the coating. The coating was found to be resistant to oxidation when tested in air up to 1200 °C. A maximum 100 μm of coating thickness was achieved on each side of the substrate.

  19. Development of EUV multilayer mirrors for astronomical observation in IPOE

    NASA Astrophysics Data System (ADS)

    Zhu, Jingtao; Wang, Xiaoqiang; Xu, Jing; Chen, Rui; Huang, Qiushi; Bai, Liang; Zhang, Zhong; Wang, Zhanshan; Chen, Lingyan

    2008-08-01

    Three kinds of multilayer mirrors were developed for solar observation and earth's magnetosphere observation at Extreme Ultraviolet (EUV) wavelength region. The first one is Mo/Si multilayer mirror, designed for solar Fe-XII emission line at wavelength of 19.5nm. The reflectivities are in the range of 38.7~42.9%, measured at National Synchrotron Radiation Laboratory (NSRL), Hefei, China. The second high-reflective multilayer is designed for solar He-II radiation at 30.4 nm. At this wavelength, SiC/Mg multilayers were investigated, and as high as 50.0% measured reflectivity was obtained at incident angle of 10°. Aperiodic SiC/Mg multilayers were also designed for wide angular ranges of 15-22° and 12-21°. The third multilayer mirror was a dual-function mirror used for earth's magnetosphere observation, which requires high-reflective for He-II emission line at wavelength of 30.4nm but low-reflectance at 58.4nm from ionosphere He-I emission. Using aperiodic SiC/Mg multilayer stack, the dual-function multilayer mirror was designed by genetic algorithm. Compared to periodic multilayer, the dual-function multilayer suppresses the reflectivity for He-I at 58.4nm from 2.2% to 0.1%, without loss of the reflection for He-II at 30.4nm, significantly. These multilayer mirrors were all prepared by magnetron sputtering system in IPOE, and measured at NSRL, China.

  20. Current research activities in the field of multilayer for EUV, soft x-ray and x-rays in IPOE

    NASA Astrophysics Data System (ADS)

    Wang, Zhanshan; Wang, Fengli; Zhang, Zhong; Wang, Hongchang; Wu, Wenjuan; Zhang, Shumin; Gu, Zhongxiang; Cheng, Xinbin; Wang, Bei; Qin, Shuji; Chen, Lingyan

    2006-01-01

    The present status of studies on EUV, soft x-ray and x-ray multilayer in the Institute of Precision Optical Engineering (IPOE) is briefly reviewed. With the aim of realizing a Mach-Zender interferometer working at 13.9nm, we have developed a semitransparent beam splitter with multilayer deposited on the back side of a silicon nitride membrane. On the basis of the experimental optical properties of the beam splitter, design has been performed to define the multilayer structure that provides the highest product of reflectivity and transmission. Optimized Mo/Si multilayer has been successfully deposited on the back side of a silicon nitride membrane by use of the magnetron sputtering. Measurements by means of a reflectometer in Beijing Synchrotron Radiation Facility at 13.9nm and at an angle of 7.2° provide a reflectivity of 20% and a transmission of 22%. Such a beam splitter has been used for X-ray Mach-Zender interferometer at 13.9nm. The broadband multilayer analyzer in the range between 12.4nm and 20nm is designed, and made which can deviate the Quasi-Brewster's angle several degree and show very high polarization. The main feature of our design approach is the use of an analytical solution as a starting point for direct computer search, and the desired results can be given in a reasonable time. The method can be applied in different spectral range for suitable material combination. Supermirrors with broad angular band working at different wavelength such as Cu Kα line are designed, manufactured and measured. The results show that the performance of the supermirrors is in agreement with designed data.

  1. Laser-plasma debris from a rotating cryogenic-solid-Xe target

    SciTech Connect

    Amano, Sho; Inaoka, Yutaka; Hiraishi, Hiroki; Miyamoto, Shuji; Mochizuki, Takayasu

    2010-02-15

    We investigate the characteristics of laser plasma debris that is responsible for damaging optics. The debris is composed of fast ions, neutral particles, and fragments, and originates from a solid Xe target on a rotating drum that we developed as an extreme ultraviolet (EUV) source. The ice fragments appear to be a problem most notably with solid Xe targets; however, we find that the damage induced by Xe ice fragments can be avoided by simply reducing the laser pulse energy. We find the number of fast neutral particles to be an order of magnitude less than the number of ions, and we clarify that the plasma debris is primarily composed of fast ions. In addition, we find that the number of fast ions having a few dozen keV of energy decreases when using the rotating target compared with the rest target. We attribute this to a gas curtain effect from the Xe gas localized at the rotating target surface. We estimate the sputtering rate of the Mo/Si mirror, which is caused primarily by the fast ions, to be 104 nm/1x10{sup 6} shots at 190 mm from the source plasma and at an 11.25 deg. angle from the incident laser beam. Up to the 1x10{sup 6} shots exposure, remarkable degradation of the mirror reflectivity is not observed though the sputtering damages the mirror. Mitigation of the ions by using gas and/or magnetic fields will further improve the mirror lifetime. By comparing with a liquid jet Xe target, we conclude that the sputtering rate per conversion efficiency when using the solid Xe targets on the rotating drum is the same as that when using the liquid Xe targets. The high conversion efficiency of 0.9% in the rotating drum solid Xe target makes this technique useful for developing laser plasma EUV sources.

  2. Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source

    SciTech Connect

    Barkusky, Frank; Bayer, Armin; Peth, Christian; Mann, Klaus

    2009-01-01

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-driven EUV plasma source utilizing a solid Au target. By 10x demagnified imaging of the plasma a maximum pulse energy density of {approx}0.73 J/cm{sup 2} at a wavelength of 13.5 nm can be achieved in the image plane of the objective at a pulse duration of 8.8 ns. In this paper we present EUV photoetching rates measured for polymethyl methacrylate, polycarbonate, and polytetrafluoroethylene at various fluence levels. A linear dependence between etch depth and applied EUV pulse number could be observed without the necessity for any incubation pulses. By evaluating the slope of these data, etch rates were determined, revealing also a linear behavior for low fluences. A threshold energy density could not be observed. The slope of the linear etch regime as well as deviations from the linear trend at higher energy densities are discussed and compared to data known from deep UV laser ablation. Furthermore, the surface roughness of the structured polymers was measured by atomic force microscopy and compared to the nonirradiated polymer surface, indicating a rather smooth etch process (roughness increase of 20%-30%). The different shapes of the etch craters observed for the three polymers at high energy densities can be explained by the measured fluence dependence of the etch rates, having consequences for the proper use of polymer ablation for beam profiling of focused EUV radiation.

  3. Early diagenesis of germanium in sediments of the Antarctic South Atlantic: In search of the missing Ge sink

    SciTech Connect

    King, S.L.; Froelich, P.N.; Jahnke, R.A.

    2000-04-01

    Pore water and solid-phase geochemistry profiles were obtained from several cores between 41{degree}S and 53{degree}S in the Atlantic sector of the Southern Ocean. Pore water nitrate, manganese, and iron profiles delineate standard redox zones in these sediments, and help characterize those with classic vs. burn-down behaviors. Pore water Si and Ge profiles demonstrate that Ge released during opal dissolution is removed pervasively throughout the uppermost interval of silicate release, and also downwards into the suboxic zone by as yet unidentified precipitation mechanisms. These results indicate that early diagenesis of Ge is uncoupled from that of opal. Solid-phase extractions (Fe, Mn, U, Mo, Ge, Cu, Ni, Co, V, and Cd) in a few cores suggest that anthigenic Ge removal in the suboxic zone is not associated with peaks in authigenic Mn cycling (MnO{sub 2} and related metals) but rather with processes deeper in the sediments, perhaps Fe or U diagenesis. Below the interval of Ge removal, pre water Ge increases linearly with depth by over two orders of magnitude, indicating a deep (below recovery) source of large magnitude. The fraction of opal-derived Ge precipitated authigenically in these sediments ranges from {approximately}1 to 96% and correlates strongly with the detrital fraction as well as the detrital to opal ratio, both of which generally decrease from north to south. The Ge sink observed in these sediments would need to be globally representative to account for the entire missing Ge sink in today's oceanic Ge balance, which seems unlikely. Benthic fluxes of Ge and Si estimated from these pore water profiles and from measurements in three benthic flux chamber experiments at high carbon-rain continental margin sites demonstrate that the Ge/Si rate released from the seafloor in locations with high benthic silicate and carbon fluxes is congruent with Holocene opal dissolution (Ge/Si {approximately} 0.7 x 10{sup {minus}6}). In contrast, Ge/Si flux ratios in areas

  4. Early diagenesis of germanium in sediments of the Antarctic South Atlantic: In search of the missing Ge-sink

    NASA Astrophysics Data System (ADS)

    King, S. L.; Froelich, P. N.; Jahnke, R. A.

    2000-04-01

    Pore water and solid-phase geochemistry profiles were obtained from several cores between 41°S and 53°S in the Atlantic sector of the Southern Ocean. Pore water nitrate, manganese, and iron profiles delineate standard redox zones in these sediments, and help characterize those with "classic" vs. "burn-down" behaviors. Pore water Si and Ge profiles demonstrate that Ge released during opal dissolution is removed pervasively throughout the uppermost interval of silicate release, and also downwards into the suboxic zone by as yet unidentified precipitation mechanisms. These results indicate that early diagenesis of Ge is uncoupled from that of opal. Solid-phase extractions (Fe, Mn, U, Mo, Ge, Cu, Ni, Co, V, and Cd) in a few cores suggest that authigenic Ge removal in the suboxic zone is not associated with peaks in authigenic Mn cycling (MnO 2 and related metals) but rather with processes deeper in the sediments, perhaps Fe or U diagenesis. Below the interval of Ge removal, pore water Ge increases linearly with depth by over two orders of magnitude, indicating a deep (below recovery) source of large magnitude. The fraction of opal-derived Ge precipitated authigenically in these sediments ranges from ˜1 to 96% and correlates strongly with the detrital fraction as well as the detrital to opal ratio, both of which generally decrease from north to south. The Ge sink observed in these sediments would need to be globally representative to account for the entire "missing" Ge sink in today's oceanic Ge balance, which seems unlikely. Benthic fluxes of Ge and Si estimated from these pore water profiles and from measurements in three benthic flux chamber experiments at high carbon-rain continental margin sites demonstrate that the Ge/Si ratio released from the seafloor in locations with high benthic silicate and carbon fluxes is congruent with Holocene opal dissolution (Ge/Si ≈ 0.7 × 10 -6). In contrast, Ge/Si flux ratios in areas with low silicate fluxes are Ge

  5. Interfacial adhesion for microelectronics and MEMS devices

    NASA Astrophysics Data System (ADS)

    Kennedy, Marian Siobhan

    2007-12-01

    The reliability of thin film systems is important to the continued development of microelectronic and micro-electro-mechanical systems. Most often, reliability of these systems is tied to the ability of the films to remain adhered to its substrate. By measuring the amount of energy to separate the film, interfacial fracture energy, and prediciting trends researchers can predicts film lifetimes. Recent work to measure this energy has resulted in several different testing techniques including spontaneous buckling, indentation induced delamination and four point bending. Literature has shown good agreement between delamination test methods, but only when energy dissipation into the substrate is minimized. Using a W/Si system, the effect of energy dissipation was shown to decrease from 0.6 J/m2 to 0.2 J/m2 between different methods; one where the only fracture was along the interface and the other where cracking also occurred in the film and substrate. For systems where fracture only occurs along the interface, such as Au/Si, the calculated fracture energies are identical if the energy put into the system is kept near the needed strain energy to cause delamination. Overlayers of different stresses and thickness on Au/Si showed that the adhesion energies could change by a factor of three (Chapter 3). This dependence on applied energy is also shown when comparisons of four point bending and stressed overlayer test methods were completed on Pt/Si systems. The fracture energies of Pt/Ti/SiO2 were studied using four-point bending and compressive overlayers. Varying the thickness of the Ti film from 2 to 17 nm in a Pt/Ti/SiO2 system, both test methods showed an increase of adhesion energy until the nominal Ti thickness was 12nm. Then this adhesion energy began to decrease. This decrease was due to an increase in the Pt grain size after a nominal 12nm thickness (Chapter 4 and 5). While the trends in energy release rate are similar, the magnitude of the toughness between the

  6. The development of colour-encapsulated microspheres for novel colour cosmetics.

    PubMed

    Jones, Stephen R; Grey, Bryan D; Mistry, Kishor K; Wildgust, Paul G

    2009-06-01

    In the present study, the preparation, characterization and colour retention properties of organic colour-loaded microspheres are described. The study aimed to produce shatter-resistant, low-bleeding polymeric microspheres with particle diameters of 20 µm containing 10-20% (w/w) of the Food, Drug, and Cosmetic grade colourants FD&C Blue No. 1 Al Lake, FD&C Yellow No. 5 Al Lake and D&C Red No. 36 by utilizing an aqueous-dispersed polymer water-in-oil (W/O) solvent evaporation process featuring styrene/acrylates-based copolymers. The influences of matrix polymeric components on the shape, integrity and dye retention of the microspheres were studied. Encapsulation matrices based on alkali soluble polymers yielded misshapen spheroids that were prone both to swelling and decreased dye retention in aqueous environments, as well as loss of shape at 70°C in cosmetic oils under shear. A resin supported emulsion (RSE)-based matrix, in comparison, yielded highly spherical microspheres resistant to shape deformation and swelling. Additions of up to 15% (w/w) of an alkali soluble polymer to the RSE system improved colour dispersion without detrimentally affecting the structural integrity of the microspheres while also slightly decreasing dye concentrations released into aqueous solutions. The in vitro dye release of the colour-loaded microspheres in a cosmetic-type water-in-silicone (W/Si) emulsion was evaluated and compared to the in vitro dye release studies in aqueous solutions. No direct correlations between the emulsion system and single-component aqueous solutions could be made. Dye-release levels evaluated from contacting the microspheres with a complex aqueous medium (CAM5), which incorporated ingredient classes typically encountered in the aqueous phase of an emulsion, were found to correlate to levels determined in the generic W/Si emulsion with a 93% linear regression between the data sets. This study demonstrates that the CAM5 protocol (or, alternatively, a CAM2

  7. Two-dimensional trilayer grating with a metal/insulator/metal structure as a thermophotovoltaic emitter.

    PubMed

    Song, Jinlin; Si, Mengting; Cheng, Qiang; Luo, Zixue

    2016-02-20

    A thermophotovoltaic system that converts thermal energy into electricity has considerable potential for applications in energy utilization fields. However, intensive emission in a wide spectral and angular range remains a challenge in improving system efficiency. This study proposes the use of a 2D trilayer grating with a tungsten/silica/tungsten (W/SiO2/W) structure on a tungsten substrate as a thermophotovoltaic emitter. The finite-difference time-domain method is employed to simulate the radiative properties of the proposed structure. A broadband high emittance with an average spectral emittance of 0.953 between 600 and 1800 nm can be obtained for both transverse magnetic and transverse electric polarized waves. On the basis of the inductance-capacitance circuit model and dispersion relation analyses, this phenomenon is mainly considered as the combined contribution of surface plasmon polaritons and magnetic polaritons. A parametric study is also conducted on the emittance spectrum of the proposed structure, considering geometric parameters, polar angles, and azimuthal angles for both TM and TE waves. The study demonstrates that the emitter has good wavelength selectivity and polarization insensitivity in a wide geometric and angular range.

  8. Electrochromic behavior of W(x)Si(y)O(z) thin films prepared by reactive magnetron sputtering at normal and glancing angles.

    PubMed

    Gil-Rostra, Jorge; Cano, Manuel; Pedrosa, José M; Ferrer, Francisco Javier; García-García, Francisco; Yubero, Francisco; González-Elipe, Agustín R

    2012-02-01

    This work reports the synthesis at room temperature of transparent and colored W(x)Si(y)O(z) thin films by magnetron sputtering (MS) from a single cathode. The films were characterized by a large set of techniques including X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectrometry (RBS), Fourier transform infrared (FT-IR), and Raman spectroscopies. Their optical properties were determined by the analysis of the transmission and reflection spectra. It was found that both the relative amount of tungsten in the W-Si MS target and the ratio O(2)/Ar in the plasma gas were critical parameters to control the blue coloration of the films. The long-term stability of the color, attributed to the formation of a high concentration of W(5+) and W(4+) species, has been related with the formation of W-O-Si bond linkages in an amorphous network. At normal geometry (i.e., substrate surface parallel to the target) the films were rather compact, whereas they were very porous and had less tungsten content when deposited in a glancing angle configuration. In this case, they presented outstanding electrochromic properties characterized by a fast response, a high coloration, a complete reversibility after more than one thousand cycles and a relatively very low refractive index in the bleached state. PMID:22208156

  9. Hyperbolic metamaterial-based near-field thermophotovoltaic system for hundreds of nanometer vacuum gap.

    PubMed

    Jin, Seokmin; Lim, Mikyung; Lee, Seung S; Lee, Bong Jae

    2016-03-21

    Artificially designed hyperbolic metamaterial (HMM) possesses extraordinary electromagnetic features different from those of naturally existing materials. In particular, the dispersion relation of waves existing inside the HMM is hyperbolic rather than elliptical; thus, waves that are evanescent in isotropic media become propagating in the HMM. This characteristic of HMMs opens a novel way to spectrally control the near-field thermal radiation in which evanescent waves in the vacuum gap play a critical role. In this paper, we theoretically investigate the performance of a near-field thermophotovoltaic (TPV) energy conversion system in which a W/SiO2-multilayer-based HMM serves as the emitter at 1000 K and InAs works as the TPV cell at 300 K. By carefully designing the thickness of constituent materials of the HMM emitter, the electric power of the near-field TPV devices can be increased by about 6 times at 100-nm vacuum gap as compared to the case of the plain W emitter. Alternatively, in regards to the electric power generation, HMM emitter at experimentally achievable 100-nm vacuum gap performs equivalently to the plain W emitter at 18-nm vacuum gap. We show that the enhancement mechanism of the HMM emitter is due to the coupled surface plasmon modes at multiple metal-dielectric interfaces inside the HMM emitter. With the minority carrier transport model, the optimal p-n junction depth of the TPV cell has also been determined at various vacuum gaps. PMID:27136882

  10. Speciation of potentially mobile Si in Yangtze Estuary surface sediments: estimates using a modified sequential extraction technique.

    PubMed

    Zhu, Huagang; Wang, Chao; Wang, Peifang; Hou, Jun; Qian, Jin; Ao, Yanhui; Liu, Cui

    2016-09-01

    To improve our understanding of the Si-related biogeochemical processes that occur in estuarine ecosystems with large subaqueous deltas (e.g., the Yangtze Estuary; YE), the speciation of Si in the surface sediments of the YE was investigated. The relationships between the different Si species and sediment bulk parameters were also discussed. Based on modified sequential extraction method, we can successfully estimate the following five sedimentary potentially mobile Si pools: weak acid leachable Si (W-Si); Si bound to organic matter (H-Si); Si coprecipitated with amorphous Fe/Al oxides (O-Si); Si coprecipitated with crystalline Fe/Al oxides (Ouv-Si), and biogenic silica (B-Si). The total potentially mobile Si pool (T-Si) ranged between 1689.31 and 5487.10 μg/g, with high values observed in deltaic mud deposits. The Si fractions were closely correlated with grain size compositions, except for O-Si. In deltaic mud deposits, efficient loss of organic matters and recycling of Fe oxides probably resulted in the amorphous or poorly crystalline Fe oxides uncoupled with the clay fractions, and thus leading to the lack of correlation between O-Si and grain size. As compared with Ouv-Si, the O-Si should possess stronger mobility, which highlights the importance of quantifying the O-Si pool in deltaic sediments. PMID:27335020

  11. Synthesis, structural and spectroscopic properties of acentric triple molybdate Cs2NaBi(MoO4)3

    NASA Astrophysics Data System (ADS)

    Savina, A. A.; Atuchin, V. V.; Solodovnikov, S. F.; Solodovnikova, Z. A.; Krylov, A. S.; Maximovskiy, E. A.; Molokeev, M. S.; Oreshonkov, A. S.; Pugachev, A. M.; Khaikina, E. G.

    2015-05-01

    New ternary molybdate Cs2NaBi(MoO4)3 is synthesized in the system Na2MoO4-Cs2MoO4-Bi2(MoO4)3. The structure of Cs2NaBi(MoO4)3 of a new type is determined in noncentrosymmetric space group R3c, a=10.6435(2), c=40.9524(7) Å, V=4017.71(13) Å3, Z=12 in anisotropic approximation for all atoms taking into account racemic twinning. The structure is completely ordered, Mo atoms are tetrahedrally coordinated, Bi(1) and Bi(2) atoms are in octahedra, and Na(1) and Na(2) atoms have a distorted trigonal prismatic coordination. The Cs(1) and Cs(2) atoms are in the framework cavities with coordination numbers 12 and 10, respectively. No phase transitions were found in Cs2NaBi(MoO4)3 up to the melting point at 826 K. The compound shows an SHG signal, I2w/I2w(SiO2)=5 estimated by the powder method. The vibrational properties are evaluated by Raman spectroscopy, and 26 narrow lines are measured.

  12. Two-dimensional trilayer grating with a metal/insulator/metal structure as a thermophotovoltaic emitter.

    PubMed

    Song, Jinlin; Si, Mengting; Cheng, Qiang; Luo, Zixue

    2016-02-20

    A thermophotovoltaic system that converts thermal energy into electricity has considerable potential for applications in energy utilization fields. However, intensive emission in a wide spectral and angular range remains a challenge in improving system efficiency. This study proposes the use of a 2D trilayer grating with a tungsten/silica/tungsten (W/SiO2/W) structure on a tungsten substrate as a thermophotovoltaic emitter. The finite-difference time-domain method is employed to simulate the radiative properties of the proposed structure. A broadband high emittance with an average spectral emittance of 0.953 between 600 and 1800 nm can be obtained for both transverse magnetic and transverse electric polarized waves. On the basis of the inductance-capacitance circuit model and dispersion relation analyses, this phenomenon is mainly considered as the combined contribution of surface plasmon polaritons and magnetic polaritons. A parametric study is also conducted on the emittance spectrum of the proposed structure, considering geometric parameters, polar angles, and azimuthal angles for both TM and TE waves. The study demonstrates that the emitter has good wavelength selectivity and polarization insensitivity in a wide geometric and angular range. PMID:26906580

  13. Technologies for manufacturing of high angular resolution multilayer coated optics for future new hard x-ray missions: a status report

    NASA Astrophysics Data System (ADS)

    Borghi, G.; Vernani, D.; Marchi Boscolo, E.; Citterio, O.; Grisoni, G.; Kools, J.; Marioni, F.; Orlandi, A.; Ritucci, A.; Rossi, M.; Salmaso, G.; Valsecchi, G.; Basso, S.; Pareschi, G.; Spiga, D.; Tagliaferri, G.; Negri, B.

    2009-08-01

    High throughput lightweight Hard X-ray Optics manufactured via electroforming replication process from supersmooth mandrels are the primary candidate for some of future New Hard X-ray missions. Media Lario Technologies (MLT) is the industrial enabler exploiting the electroforming technology initially applied for the ESA XMM-Newton mission and further developed in cooperation with Brera Astronomical Observatory (INAF/OAB). The current and ongoing development activities in Media Lario Technologies complement the electroforming technology with a suite of critical manufacturing and assembly of the Mirror Module Unit. In this paper, the progress on mandrels manufacturing, mirror shell replication, multilayer coating deposition, mirror module integration, and relevant metrology is reported in view of the upcoming production phase. Mandrel production is a key point in terms of performances and schedule; the results from of NiP prototype mandrels fabricated using a proprietary multistep surface finishing process are reported. The progress in the replication of ultrathin Nickel and Nickel-Cobalt substrates gold coated mirror shells is reported together with the results of MLT Magnetron Sputtering multilayer coating technology for the hard x-ray waveband and its application to W/Si. Due to the criticality of low thickness mirror handling, the integration concept has been refined and tested on prototype mechanical structures under full illumination UV vertical optical bench.

  14. Development of a prototype nickel optic for the Constellation-X hard x-ray telescope: III

    NASA Astrophysics Data System (ADS)

    Romaine, S.; Basso, S.; Bruni, R. J.; Burkert, W.; Citterio, O.; Conti, G.; Engelhaupt, D.; Freyberg, M. J.; Ghigo, M.; Gorenstein, P.; Gubarev, M.; Hartner, G.; Mazzoleni, F.; O'Dell, S.; Pareschi, G.; Ramsey, B. D.; Speegle, C.; Spiga, D.

    2005-08-01

    The Constellation-X (Con-X) mission planned for launch in 2015, will feature an array of Hard X-ray telescopes (HXT) with a total collecting area greater than 1500 cm2 at 40 keV. Two technologies are being investigated for the optics of these telescopes, including multilayer coated Electroformed-Nickel-Replicated (ENR) shells. The attraction of the ENR process is that the resulting full-shell optics are inherently stable and offer the prospect of better angular resolution which results in lower background and higher instrument sensitivity. We are building a prototype HXT mirror module using an ENR process to fabricate the individual shells. This prototype consists of 5 shells with diameters ranging from 150 mm to 280 mm with a length of 426 mm. The innermost of these will be coated with iridium, while the remainder will be coated with graded d-spaced W/Si multilayers. Parts I and II of this work were presented at the SPIE meetings in 2003 and 2004. This paper presents a progress update and focuses on accomplishments during this past year. In particular, we will present results from full illumination X-ray tests of multilayer coated shells, taken at the MPE-Panter X-ray facility.

  15. Development of a prototype nickel optic for the Constellation-X hard x-ray telescope: IV

    NASA Astrophysics Data System (ADS)

    Romaine, S.; Basso, S.; Bruni, R. J.; Burkert, W.; Citterio, O.; Conti, G.; Engelhaupt, D.; Freyberg, M. J.; Ghigo, M.; Gorenstein, P.; Gubarev, M.; Hartner, G.; Mazzoleni, F.; O'Dell, S.; Pareschi, G.; Ramsey, B. D.; Speegle, C.; Spiga, D.

    2006-06-01

    The Constellation-X mission planned for launch in 2015-2020 timeframe, will feature an array of Hard X-ray telescopes (HXT) with a total collecting area greater than 1500 cm2 at 40 keV. Two technologies are being investigated for the optics of these telescopes, one of which is multilayer-coated Electroformed-Nickel-Replicated (ENR) shells. The attraction of the ENR process is that the resulting full-shell optics are inherently stable and offer the prospect of better angular resolution which results in lower background and higher instrument sensitivity. We are building a prototype HXT mirror module using an ENR process to fabricate the individual shells. This prototype consists of 5 shells with diameters ranging from 15 cm to 28 cm with a length of 42.6 cm. The innermost of these will be coated with iridium, while the remainder will be coated with graded d-spaced W/Si multilayers. The assembly structure has been completed and last year we reported on full beam illumination results from the first test shell mounted in this structure. We have now fabricated and coated two (15 cm and 23 cm diameter) 100 micron thick shells which have been aligned and mounted. This paper presents the results of full beam illumination X-ray tests, taken at MPE-Panter. The HEW of the individual shells will be discussed, in addition to results from the full two shell optic test.

  16. Speciation of potentially mobile Si in Yangtze Estuary surface sediments: estimates using a modified sequential extraction technique.

    PubMed

    Zhu, Huagang; Wang, Chao; Wang, Peifang; Hou, Jun; Qian, Jin; Ao, Yanhui; Liu, Cui

    2016-09-01

    To improve our understanding of the Si-related biogeochemical processes that occur in estuarine ecosystems with large subaqueous deltas (e.g., the Yangtze Estuary; YE), the speciation of Si in the surface sediments of the YE was investigated. The relationships between the different Si species and sediment bulk parameters were also discussed. Based on modified sequential extraction method, we can successfully estimate the following five sedimentary potentially mobile Si pools: weak acid leachable Si (W-Si); Si bound to organic matter (H-Si); Si coprecipitated with amorphous Fe/Al oxides (O-Si); Si coprecipitated with crystalline Fe/Al oxides (Ouv-Si), and biogenic silica (B-Si). The total potentially mobile Si pool (T-Si) ranged between 1689.31 and 5487.10 μg/g, with high values observed in deltaic mud deposits. The Si fractions were closely correlated with grain size compositions, except for O-Si. In deltaic mud deposits, efficient loss of organic matters and recycling of Fe oxides probably resulted in the amorphous or poorly crystalline Fe oxides uncoupled with the clay fractions, and thus leading to the lack of correlation between O-Si and grain size. As compared with Ouv-Si, the O-Si should possess stronger mobility, which highlights the importance of quantifying the O-Si pool in deltaic sediments.

  17. Recovery of iron and calcium aluminate slag from high-ferrous bauxite by high-temperature reduction and smelting process

    NASA Astrophysics Data System (ADS)

    Zhang, Ying-yi; Lü, Wei; Qi, Yuan-hong; Zou, Zong-shu

    2016-08-01

    A high-temperature reduction and smelting process was used to recover iron and calcium aluminate slag from high-ferrous bauxite. The effects of w(CaO)/ w(SiO2) ratio, anthracite ratio, and reduction temperature and time on the recovery and size of iron nuggets and on the Al2O3 grade of the calcium aluminate slag were investigated through thermodynamic calculations and experiments. The optimized process conditions were the bauxite/anthracite/slaked lime weight ratio of 100:16.17:59.37, reduction temperature of 1450°C and reduction time of 20 min. Under these conditions, high-quality iron nuggets and calcium aluminate slag were obtained. The largest size and the highest recovery rate of iron nuggets were 11.42 mm and 92.79wt%, respectively. The calcium aluminate slag mainly comprised Ca2SiO4 and Ca12Al14O33, with small amounts of FeAl2O4, CaAl2O4, and Ca2Al2SiO7.

  18. [Membrane surface fouling properties in MBRs for high-salinity wastewater treatment].

    PubMed

    Li, Bin; Wang, Zhi-Wei; An, Ying; Wu, Zhi-Chao

    2014-02-01

    The properties of membrane foulants in MBR treating high-salinity wastewater were studied. Results showed that the removal efficiency of organics and NH4(+) -N was stable and high-quality effluent was obtained after the operation time of 121 d; the ratio of VSS/ SS decreased and SVI declined at the same time, indicating that the inorganic content of sludge increased which might lead to more compact flocs and higher settling ability; SMP and EPS of the sludge were largely changed with a lower proportion of protein and a higher proportion of humic acid. Scanning electron microscope-energy diffusive X-ray analyzer (SEM-EDX) demonstrated that Na, Al, Mg, Ca, K, Fe, Ti, Cr, W, Si and Cl were the major inorganic elements in membrane foulants; Gel filtration chromatography (GFC) illustrated that there were organic matters with high molecular weight trapped by membrane and formed the membrane foulants; Fourier transform infrared (FTIR) spectroscopy and Excitation emission matrix (EEM) fluoresce spectroscopy discovered that carbohydrates, protein and humic acid were the main content of organics in membrane foulants.; quantitative analysis of membrane foulants showed that the amount of inorganic membrane foulants were significant when treating high-salinity wastewater. PMID:24812959

  19. The nuclear spectroscopic telescope array (NuSTAR) high-energy X-ray mission

    NASA Astrophysics Data System (ADS)

    Madsen, Kristin K.; Harrison, Fiona A.; An, Hongjun; Boggs, Steven E.; Christensen, Finn E.; Cook, Rick; Craig, William W.; Forster, Karl; Fuerst, Felix; Grefenstette, Brian; Hailey, Charles J.; Kitaguchi, Takao; Markwardt, Craig; Mao, Peter; Miyasaka, Hiromasa; Rana, Vikram R.; Stern, Daniel K.; Zhang, William W.; Zoglauer, Andreas; Walton, Dominic; Westergaard, Niels J.

    2014-07-01

    The Nuclear Spectroscopic Telescope Array (NuSTAR) mission was launched on 2012 June 13 and is the first focusing high-energy X-ray telescope in orbit operating above ~10 keV. NuSTAR flies two co-aligned Wolter-I conical approximation X-ray optics, coated with Pt/C and W/Si multilayers, and combined with a focal length of 10.14 meters this enables operation from 3-79 keV. The optics focus onto two focal plane arrays, each consisting of 4 CdZnTe pixel detectors, for a field of view of 12.5 arcminutes. The inherently low background associated with concentrating the X-ray light enables NuSTAR to probe the hard X-ray sky with a more than 100-fold improvement in sensitivity, and with an effective point spread function FWHM of 18 arcseconds (HPD ~1), NuSTAR provides a leap of improvement in resolution over the collimated or coded mask instruments that have operated in this bandpass. We present in-orbit performance details of the observatory and highlight important science results from the first two years of the mission.

  20. Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection

    NASA Astrophysics Data System (ADS)

    Patterson, N.; Adams, D. P.; Hodges, V. C.; Vasile, M. J.; Michael, J. R.; Kotula, P. G.

    2008-06-01

    We report a direct, ion drilling technique that enables the reproducible fabrication and placement of nanopores in membranes of different thickness. Using a 30 keV focused Ga ion beam column combined with an in situ, back face, multi-channelplate particle detector, nanopores are sputtered in Si3N4 and W/Si3N4 to have diameters as small as 12 nm. Transmission electron microscopy shows that focused ion beam-drilled holes are near-conical with the diameter decreasing from entry to exit side. By monitoring the detector signal during ion exposure, the drilled hole width can be minimized such that the exit-side diameter is smaller than the full width at half-maximum of the nominally Gaussian-shaped incident beam. Judicious choice of the beam defining aperture combined with back face particle detection allows for reproducible exit-side hole diameters between 18 and 100 nm. The nanopore direct drilling technique does not require potentially damaging broad area exposure to tailor hole sizes. Moreover, this technique successfully achieves breakthrough despite the effects of varying membrane thickness, redeposition, polycrystalline grain structure, and slight ion beam current fluctuations.

  1. Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection.

    PubMed

    Patterson, N; Adams, D P; Hodges, V C; Vasile, M J; Michael, J R; Kotula, P G

    2008-06-11

    We report a direct, ion drilling technique that enables the reproducible fabrication and placement of nanopores in membranes of different thickness. Using a 30 keV focused Ga ion beam column combined with an in situ, back face, multi-channelplate particle detector, nanopores are sputtered in Si(3)N(4) and W/Si(3)N(4) to have diameters as small as 12 nm. Transmission electron microscopy shows that focused ion beam-drilled holes are near-conical with the diameter decreasing from entry to exit side. By monitoring the detector signal during ion exposure, the drilled hole width can be minimized such that the exit-side diameter is smaller than the full width at half-maximum of the nominally Gaussian-shaped incident beam. Judicious choice of the beam defining aperture combined with back face particle detection allows for reproducible exit-side hole diameters between 18 and 100 nm. The nanopore direct drilling technique does not require potentially damaging broad area exposure to tailor hole sizes. Moreover, this technique successfully achieves breakthrough despite the effects of varying membrane thickness, redeposition, polycrystalline grain structure, and slight ion beam current fluctuations. PMID:21825787

  2. Color contrast of red blood cells on solid substrate

    NASA Astrophysics Data System (ADS)

    Paiziev, Adkham A.

    2013-02-01

    In present study we developed the new method of colour visualization of red blood cells without using any chemical staining. The method based on physical phenomena a white light interference on thin transparent films. It is shown that in the case of thin human blood smears colour interference contrast occurs on solid polished substrates. The best contrast shows substrates with maximal refractive index (Mo, W, Si). These materials have been selected as substrate instead of ordinary microscopic slide in reflected light microscopy. It is shown that reflection of incident white light from blood cell surface and boundary cell-substrate generate two coherent lights. The second one (object signal) after passing through red blood cell gathers additional phase and after interference interaction with reference signal (light reflected from outer cell surface) enables cell image in colour. Number of blood smears of healthy persons (control) and patients who were diagnosed with cancer are presented. It is concluded that the offered method may be used as an effective diagnostic tool to detect early stage blood cells lesion by its interference painting in white light. Offered method may be used in research laboratories, hospitals, diagnostic centres, emergency medicine and other as complementary diagnostic tool to present convenient optical and electron microscopy technique.

  3. Study of self-compliance behaviors and internal filament characteristics in intrinsic SiOx-based resistive switching memory

    NASA Astrophysics Data System (ADS)

    Chang, Yao-Feng; Fowler, Burt; Zhou, Fei; Chen, Ying-Chen; Lee, Jack C.

    2016-01-01

    Self-compliance characteristics and reliability optimization are investigated in intrinsic unipolar silicon oxide (SiOx)-based resistive switching (RS) memory using TiW/SiOx/TiW device structures. The program window (difference between SET voltage and RESET voltage) is dependent on external series resistance, demonstrating that the SET process is due to a voltage-triggered mechanism. The program window has been optimized for program/erase disturbance immunity and reliability for circuit-level applications. The SET and RESET transitions have also been characterized using a dynamic conductivity method, which distinguishes the self-compliance behavior due to an internal series resistance effect (filament) in SiOx-based RS memory. By using a conceptual "filament/resistive gap (GAP)" model of the conductive filament and a proton exchange model with appropriate assumptions, the internal filament resistance and GAP resistance can be estimated for high- and low-resistance states (HRS and LRS), and are found to be independent of external series resistance. Our experimental results not only provide insights into potential reliability issues but also help to clarify the switching mechanisms and device operating characteristics of SiOx-based RS memory.

  4. Hyperbolic metamaterial-based near-field thermophotovoltaic system for hundreds of nanometer vacuum gap.

    PubMed

    Jin, Seokmin; Lim, Mikyung; Lee, Seung S; Lee, Bong Jae

    2016-03-21

    Artificially designed hyperbolic metamaterial (HMM) possesses extraordinary electromagnetic features different from those of naturally existing materials. In particular, the dispersion relation of waves existing inside the HMM is hyperbolic rather than elliptical; thus, waves that are evanescent in isotropic media become propagating in the HMM. This characteristic of HMMs opens a novel way to spectrally control the near-field thermal radiation in which evanescent waves in the vacuum gap play a critical role. In this paper, we theoretically investigate the performance of a near-field thermophotovoltaic (TPV) energy conversion system in which a W/SiO2-multilayer-based HMM serves as the emitter at 1000 K and InAs works as the TPV cell at 300 K. By carefully designing the thickness of constituent materials of the HMM emitter, the electric power of the near-field TPV devices can be increased by about 6 times at 100-nm vacuum gap as compared to the case of the plain W emitter. Alternatively, in regards to the electric power generation, HMM emitter at experimentally achievable 100-nm vacuum gap performs equivalently to the plain W emitter at 18-nm vacuum gap. We show that the enhancement mechanism of the HMM emitter is due to the coupled surface plasmon modes at multiple metal-dielectric interfaces inside the HMM emitter. With the minority carrier transport model, the optimal p-n junction depth of the TPV cell has also been determined at various vacuum gaps.

  5. Design of a multilayer mirror monochromatic x-ray imager for the Z accelerator

    SciTech Connect

    Jones, B.; Deeney, C.; Pirela, A.; Meyer, C.; Petmecky, D.; Gard, P.; Clark, R.; Davis, J.

    2004-10-01

    A time-resolved pinhole camera is being developed for monochromatic soft x-ray imaging of z-pinch plasmas on the Z accelerator [R. B. Spielman et al., Phys. Plasmas 5, 2105 (1998)] at Sandia National Laboratories. Pinhole images will reflect from a planar multilayer mirror onto a microchannel plate detector. A W/Si or Cr/C multilayer reflects a narrow energy range (full width at half maximum <10 eV) centered at 277 eV with peak reflectivity up to 20%. This choice of energy will allow final implosion imaging of any wire-array z-pinch fielded on Z, as well as bench testing using a carbon K{alpha} source. Aluminized parylene filters will eliminate optical and second harmonic reflection, and the 34 deg. multilayer grazing angle will allow detector shielding from high energy x rays produced by the Z accelerator. The system will also include a standard in-line pinhole camera, which can be filtered to obtain simultaneous higher-photon-energy images. Future instruments could use multiple mirrors to image at several energies, or operate at a low grazing angle to image 1-10 keV K-shell emission.

  6. A generic model for creep rupture lifetime estimation on fibrous ceramic composites

    NASA Technical Reports Server (NTRS)

    Chuang, Tze-Jer

    1992-01-01

    Because of their high strength and toughness at elevated temperatures, fiber reinforced ceramic composites such as SiC(f)/SiC and SiC(f)/Si3N4 have become candidates for next-generation turbine engine materials. A generic model is proposed for assessing the lifetime of this class of materials when subjected to long-term creep rupture conditions. This 2D model consists of interfacial cracks growing between square grains and rectangular fibers in the direction normal to the principal tensile stress axis. Neglecting transient effects, the total lifetime is derived based on the criterion that rupture is due to coalescence of adjacent cracks. Lifetime is inversely proportional to crack growth rate, volume fraction, and aspect ratio of the fibers; but extremely sensitive to the applied stress, due to the high power of the V-K(I) law. This lifetime estimation seems to be in fair agreement with the creep rupture data of SiC(w)/Si3N4 composite with 0 and 30 vol percent reinforcement tested at 1250 C in air. TEM performed on the postcrept specimens revealed that creep damage is predominantly in the form of microcracks at matrix/matrix as well as fiber/matrix interfaces, approximately in accord with the model simulation.

  7. Mechanical Properties and Durability of "Waterless Concrete"

    NASA Technical Reports Server (NTRS)

    Toutanji, Houssam; Grugel, Richard N.

    2008-01-01

    Waterless concrete consists of molten elementary sulfur and aggregate. The aggregates in lunar environment will be lunar rocks and soil. Sulfur is present on the Moon in Troilite soil (FeS) and by oxidation soil iron and sulfur can be produced. Iron can be used to reinforce the sulfur concrete. Sulfur concrete specimens were cycled between liquid nitrogen (approximately 191 C) and room temperature (approximately 21 C) to simulate exposure to a lunar environment. Cycled and control specimens were subsequently tested in compression at room temperatures (approximately 21 C) and approximately 101 C. Test results showed that due to temperature cycling, compressive strength of cycled specimens was 20% of those non-cycled. Microscopic examination of the fracture surfaces from the cycled samples showed clear de-bonding of the sulfur from the aggregate material whereas it was seen well bonded in those non-cycled. This reduction in strength can be attributed to the large differences in thermal coefficients of expansion of the materials constituting the concrete which promoted cracking. Similar sulfur concrete mixtures were strengthened with short and long glass fibers. The glass fibers from lunar regolith simulant was melted in a 25 cc Pt-Rh crucible in a Sybron Thermoline high temperature MoSi2 furnace at melting temperatures of 1450 to 1600 C for times of 30 min to 1 hour. Glass fibers were cast from the melt into graphite crucibles and were annealed for a couple of hours at 600 C. Glass fibers and small rods were pulled from the melt. The glass melt wets the ceramic rod and long continuous glass fibers were easily hand drawn. The glass fibers were immediately coated with a protective polymer to maintain the mechanical strength. The glass fibers were used to reinforce sulfur concrete plated to improve the flexural strength of the sulfur concrete. Prisms beams strengthened with glass fibers were tested in 4-point bending test. Beams strengthened with glass fiber showed to

  8. Key issues in automatic classification of defects in post-inspection review process of photomasks

    NASA Astrophysics Data System (ADS)

    Pereira, Mark; Maji, Manabendra; Pai, Ravi R.; B. V. R., Samir; Seshadri, R.; Patil, Pradeepkumar

    2012-11-01

    The mask inspection and defect classification is a crucial part of mask preparation technology and consumes a significant amount of mask preparation time. As the patterns on a mask become smaller and more complex, the need for a highly precise mask inspection system with high detection sensitivity becomes greater. However, due to the high sensitivity, in addition to the detection of smaller defects on finer geometries, the inspection machine could report large number of false defects. The total number of defects becomes significantly high and the manual classification of these defects, where the operator should review each of the defects and classify them, may take huge amount of time. Apart from false defects, many of the very small real defects may not print on the wafer and user needs to spend time on classifying them as well. Also, sometimes, manual classification done by different operators may not be consistent. So, need for an automatic, consistent and fast classification tool becomes more acute in more advanced nodes. Automatic Defect Classification tool (NxADC) which is in advanced stage of development as part of NxDAT1, can automatically classify defects accurately and consistently in very less amount of time, compared to a human operator. Amongst the prospective defects as detected by the Mask Inspection System, NxADC identifies several types of false defects such as false defects due to registration error, false defects due to problems with CCD, noise, etc. It is also able to automatically classify real defects such as, pin-dot, pin-hole, clear extension, multiple-edges opaque, missing chrome, chrome-over-MoSi, etc. We faced a large set of algorithmic challenges during the course of the development of our NxADC tool. These include selecting the appropriate image alignment algorithm to detect registration errors (especially when there are sub-pixel registration errors or misalignment in repetitive patterns such as line space), differentiating noise from

  9. Letter Report Documenting Progress of Second Generation ATF FeCrAl Alloy Fabrication

    SciTech Connect

    Yamamoto, Y.; Yang, Y.; Field, K. G.; Terrani, K.; Pint, B. A.; Snead, L. L.

    2014-06-10

    Development of the 2nd generation ATF FeCrAl alloy has been initiated, and a candidate alloy was selected for trial tube fabrication through hot-extrusion and gun-drilling processes. Four alloys based on Fe-13Cr-4.5Al-0.15Y in weight percent were newly cast with minor alloying additions of Mo, Si, Nb, and C to promote solid-solution and second-phase precipitate strengthening. The alloy compositions were selected with guidance from computational thermodynamic tools. The lab-scale heats of ~ 600g were arc-melted and drop-cast, homogenized, hot-forged and -rolled, and then annealed producing plate shape samples. An alloy with Mo and Nb additions (C35MN) processed at 800°C exhibits very fine sub-grain structure with the sub-grain size of 1-3μm which exhibited more than 25% better yield and tensile strengths together with decent ductility compared to the other FeCrAl alloys at room temperature. It was found that the Nb addition was key to improving thermal stability of the fine sub-grain structure. Optimally, grains of less than 30 microns are desired, with grains up to and order of magnitude in desired produced through Nb addition. Scale-up effort of the C35MN alloy was made in collaboration with a commercial cast company who has a capability of vacuum induction melting. A 39lb columnar ingot with ~81mm diameter and ~305mm height (with hot-top) was commercially cast, homogenized, hot-extruded, and annealed providing 10mm-diameter bar-shape samples with the fine sub-grain structure. This commercial heat proved consistent with materials produced at ORNL at the lab-scale. Tubes and end caps were machined from the bar sample and provided to another work package for the ATF-1 irradiation campaign in the milestone M3FT-14OR0202251.

  10. Test of a multilayer-coated EUV grating for I-IV order spectroscopic measurements of the solar corona

    NASA Astrophysics Data System (ADS)

    Poletto, Luca; Frassetto, Fabio; Miotti, Paolo; Giglia, Angelo; Corso, Alain Jody; Zuppella, Paola; Pelizzo, Maria-Guglielmina; Fineschi, Silvano; Antonucci, Ester; Naletto, Giampiero; Nicolosi, Piergiorgio; Romoli, Marco

    2013-09-01

    METIS, the Multi Element Telescope for Imaging and Spectroscopy, is a coronagraph selected by the European Space Agency to be part of the payload of the Solar Orbiter mission. The original METIS proposal included four optical paths, for observations in: 1) linearly polarized visible-light (590-650 nm), 2) narrow-band ultraviolet HI Lyman-alpha (121.6 nm), 3) narrow-band extreme-ultraviolet HeII Lyman-alpha (30.4 nm), 4) spectrographic mode for the HI Lyman- alpha and He II Lyman-alpha in corona. The design, coating performances, and test activities of the grating for the spectroscopic path are here described. The grating is optimized to work at near normal incidence and to diffract the 121.6 nm radiation at the first order and the 30.4 nm at its 4th order, consequently the two spectroscopic channels are overlapped on the focal plane. The grating is spherical with variable-line-spaced rulings, 1800 gr/mm central density. The selection of the spectroscopic channel to be acquired, either the 121.6 nm or the 30.4 nm, is made by a suitable filter wheel. The grating is multilayer-coated, to have high efficiency in both the spectral channels. In this paper we describe the tests made on a prototype with flat surface and constant groove spacing. The measures have been carried out at the BEAR beamline at the ELETTRA Synchrotron in Trieste (Italy). The grating was initially coated by gold and successively by a Mo-Si multilayer optimized at 30.4 nm. The efficiencies at the first and fourth order (121.6 and 30.4 nm) have been measured before and after the multilayer deposition. The quality of the multilayer deposition has been tested by atomic force microscope measurements on the grating surface and by reflectivity measurements performed on a test reference mirror. The experimental data are compared with numerical simulations accounting for the coating roughness and the smoothening effect on the blaze profile after the multilayer deposition. To our knowledge, this is the first

  11. Nanocomposites for high-speed optical modulators and plasmonic thermal mid-infrared emitters

    NASA Astrophysics Data System (ADS)

    Demir, Veysi

    Demand for high-speed optical modulators and narrow-bandwidth infrared thermal emitters for numerous applications continues to rise and new optical devices are needed to deal with massive data flows, processing powers, and fabrication costs. Conventional techniques are usually hindered by material limitations or electronic interconnects and advances in organic nanocomposite materials and their integration into photonic integrated circuits (PICs) have been acknowledged as a promising alternative to single crystal techniques. The work presented in this thesis uses plasmonic and magneto-optic effects towards the development of novel optical devices for harnessing light and generating high bandwidth signals (>40GHz) at room and cryogenic temperatures (4.2°K). Several publications have resulted from these efforts and are listed at the end of the abstract. In our first published research we developed a narrow-bandwidth mid-infrared thermal emitter using an Ag/dielectric/Ag thin film structure arranged in hexagonal planar lattice structures. PECVD produced nanoamorphous carbon (NAC) is used as a dielectric layer. Spectrally tunable (>2 mum) and narrow bandwidth (<0.5 mum) emission peaks in the range of 4-7 mum were demonstrated by decreasing the resistivity of NAC from 1012 and 109 O.cm with an MoSi2 dopant and increasing the emitter lattice constant from 4 to 7 mum. This technique offers excellent flexibility for developing cost-effective mid-IR sources as compared to costly fiber and quantum cascade lasers (QCLs). Next, the effect of temperature on the Verdet constant for cobalt-ferrite polymer nanocomposites was measured for a series of temperatures ranging from 40 to 200°K with a Faraday rotation polarimeter. No visual change was observed in the films during thermal cycling, and ˜4x improvement was achieved at 40°K. The results are promising and further analysis is merited at 4.2°K to assess the performance of this material for cryogenic magneto-optic modulators

  12. Multilayer Optics for an Extreme Ultraviolet Lithography Tool with 70 nm Resolution

    SciTech Connect

    Soufli, R; Spiller, E; Schmidt, M A; Davidson, J C; Brabner, R F; Bullikson, E M; Kaufmann, B B; Baker, S L; Chapman, H N; Hudyma, R M; Taylor, J S; Walton, C C; Montcalm, C; Folta, J A

    2001-05-04

    One of the most critical tasks in the development of extreme ultraviolet lithography (EUVL) is the accurate deposition of reflective multilayer coatings for the mirrors comprising the EUVL tool. The second set (Set 2) of four imaging optics for an alpha-class EUVL system has been coated successfully. All four mirrors (M1, M2, M3, M4) were Mo/Si-coated during a single deposition run with a production-scale DC-magnetron sputtering system. Ideally, the multilayer coatings should not degrade the residual wavefront error of the imaging system design. For the present EUVL camera, this requirement is equivalent to depositing multilayer coatings that would add a figure error of less than 0.11 nm rms. In addition, all mirrors should be matched in centroid wavelength, in order to insure maximum throughput of the EUVL tool. In order to meet these constraints, the multilayer deposition process needs to be controlled to atomic precision. EUV measurements of the coated mirrors determined that the added figure errors due to the multilayer coatings are 0.032 nm rms (M1), 0.037 nm rms (M2), 0.040 nm rms (M3) and 0.015 nm rms (M4), well within the aforementioned requirement of 0.11 nm rms. The average wavelength among the four projection mirrors is 13.352 nm, with an optic-to-optic matching of 1{sigma}=0.010 nm. This outstanding level of wavelength matching produces 99.3% of the throughput of an ideally matched four-mirror system. Peak reflectances are 63.8% (M1), 65.2% (M2), 63.8% (M3) and 66.7% (M4). The variation in reflectance values between the four optics is consistent with their high frequency substrate roughness. It is predicted that the multilayer coatings will not introduce any aberrations in the lithographic system performance, for both static and scanned images of 70 nm-dense features.

  13. Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

    SciTech Connect

    Cardinale, G. F.; Henderson, C. C.; Goldsmith, J. E. M.; Mangat, P. J. S.; Cobb, J.; Hector, S. D.

    1999-11-01

    In two separate experiments, we have successfully demonstrated the transfer of dense- and loose-pitch line/space (L/S) photoresist features, patterned with extreme ultraviolet (EUV) lithography, into an underlying hard mask material. In both experiments, a deep-UV photoresist ({approx}90 nm thick) was spin cast in bilayer format onto a hard mask (50-90 nm thick) and was subsequently exposed to EUV radiation using a 10x reduction EUV exposure system. The EUV reticle was fabricated at Motorola (Tempe, AZ) using a subtractive process with Ta-based absorbers on Mo/Si multilayer mask blanks. In the first set of experiments, following the EUV exposures, the L/S patterns were transferred first into a SiO{sub 2} hard mask (60 nm thick) using a reactive ion etch (RIE), and then into polysilicon (350 nm thick) using a triode-coupled plasma RIE etcher at the University of California, Berkeley, microfabrication facilities. The latter etch process, which produced steep (>85 degree sign ) sidewalls, employed a HBr/Cl chemistry with a large (>10:1) etch selectivity of polysilicon to silicon dioxide. In the second set of experiments, hard mask films of SiON (50 nm thick) and SiO{sub 2} (87 nm thick) were used. A RIE was performed at Motorola using a halogen gas chemistry that resulted in a hard mask-to-photoresist etch selectivity >3:1 and sidewall profile angles {>=}85 degree sign . Line edge roughness (LER) and linewidth critical dimension (CD) measurements were performed using Sandia's GORA(c) CD digital image analysis software. Low LER values (6-9 nm, 3{sigma}, one side) and good CD linearity (better than 10%) were demonstrated for the final pattern-transferred dense polysilicon L/S features from 80 to 175 nm. In addition, pattern transfer (into polysilicon) of loose-pitch (1:2) L/S features with CDs{>=}60 nm was demonstrated. (c) 1999 American Vacuum Society.

  14. Speleothem Paleoclimatology and Modern Proxies: Calcite Farming In a Continuously Monitored Cave

    NASA Astrophysics Data System (ADS)

    Tremaine, D. M.; Froelich, P. N.; Kowalczk, A.; Kilgore, B.

    2009-12-01

    . Isotopic (δ13C, δ18O) and elemental (Ca, Mg, Si, K, Sr, Ba, U, Mo, Si, Mn, Fe) analyses of the farmed calcite will serve as a modern calibration for interpretation of paleoclimate proxies. For example, δ13C of cave-air is controlled by mixing between outside air and soilgas (see Keeling Plot below). It is likely that annual δ13C incorporation into speleothems is a function of this ventilation and seasonal mixing, rather than C3/C4 of overlying vegetation.

  15. Interdiffusion in Diffusion Couples: U-Mo v. Al and Al-Si

    SciTech Connect

    D. D. Keiser, Jr.; E. Perez; B. Yao; Y. H. Sohn

    2009-11-01

    Interdiffusion and microstructural development in the U-Mo-Al system was examined using solid-tosolid diffusion couples consisting of U-7wt.%Mo, U-10wt.%Mo and U-12wt.%Mo vs. pure Al, annealed at 600°C for 24 hours. The influence of Si alloying addition (up to 5 wt.%) in Al on the interdiffusion microstructural development was also examined using solid-to-solid diffusion couples consisting of U-7wt.%Mo, U-10wt.%Mo and U-12wt.%Mo vs. pure Al, Al-2wt.%Si, and Al-5wt.%Si annealed at 550°C up to 20 hours. Scanning electron microscopy (SEM), transmission electron microscopy (TEM) and electron probe microanalysis (EPMA) were employed to examine the development of a very fine multiphase intermetallic layer. In ternary U-Mo-Al diffusion couples annealed at 600°C for 24 hours, interdiffusion microstructure varied of finely dispersed UAl3, UAl4, U6Mo4Al43, and UMo2Al20 phases while the average composition throughout the interdiffusion zone remained constant at approximately 80 at.% Al. Interdiffusion microstructure observed by SEM/TEM analyses and diffusion paths drawn from concentration profiles determined by EPMA appear to deviate from the assumption of “local thermodynamic equilibrium,” and suggest that interdiffusion occurs via supersaturated UAl4 followed by equilibrium transformation into UAl3, U6Mo4Al43, UAl4 and UMo2Al20 phases. Similar observation was made for U-Mo vs. Al diffusion couples annealed at 550°C. The addition of Si (up to 5 wt.%) in Al significantly reduced the thickness of the intermetallic layer by changing the constituent phases of the interdiffusion zone developed in U-Mo vs. Al-Si diffusion couples. Specifically, the formation of (U,Mo)(Al,Si)3 with relatively large solubility for Mo and Si, along with UMo2Al20 phases was observed along with disappearance of U6Mo4Al43 and UAl4 phases. Simplified understanding based on U-Al, U-Si, and Mo-Si binary phase diagrams is discussed in the light of the beneficial effect of Si alloying addition.

  16. Generation of short and intense attosecond pulses

    NASA Astrophysics Data System (ADS)

    Khan, Sabih Ud Din

    Extremely broad bandwidth attosecond pulses (which can support 16as pulses) have been demonstrated in our lab based on spectral measurements, however, compensation of intrinsic chirp and their characterization has been a major bottleneck. In this work, we developed an attosecond streak camera using a multi-layer Mo/Si mirror (bandwidth can support ˜100as pulses) and position sensitive time-of-flight detector, and the shortest measured pulse was 107.5as using DOG, which is close to the mirror bandwidth. We also developed a PCGPA based FROG-CRAB algorithm to characterize such short pulses, however, it uses the central momentum approximation and cannot be used for ultra-broad bandwidth pulses. To facilitate the characterization of such pulses, we developed PROOF using Fourier filtering and an evolutionary algorithm. We have demonstrated the characterization of pulses with a bandwidth corresponding to ˜20as using synthetic data. We also for the first time demonstrated single attosecond pulses (SAP) generated using GDOG with a narrow gate width from a multi-cycle driving laser without CE-phase lock, which opens the possibility of scaling attosecond photon flux by extending the technique to peta-watt class lasers. Further, we generated intense attosecond pulse trains (APT) from laser ablated carbon plasmas and demonstrated ˜9.5 times more intense pulses as compared to those from argon gas and for the first time demonstrated a broad continuum from a carbon plasma using DOG. Additionally, we demonstrated ˜100 times enhancement in APT from gases by switching to 400 nm (blue) driving pulses instead of 800 nm (red) pulses. We measured the ellipticity dependence of high harmonics from blue pulses in argon, neon and helium, and developed a simple theoretical model to numerically calculate the ellipticity dependence with good agreement with experiments. Based on the ellipticity dependence, we proposed a new scheme of blue GDOG which we predict can be employed to extract

  17. Benchmarking ENDF/B-VII.1, JENDL-4.0 and JEFF-3.1.1 with MCNP6

    NASA Astrophysics Data System (ADS)

    van der Marck, Steven C.

    2012-12-01

    Recent releases of three major world nuclear reaction data libraries, ENDF/B-VII.1, JENDL-4.0, and JEFF-3.1.1, have been tested extensively using benchmark calculations. The calculations were performed with the latest release of the continuous energy Monte Carlo neutronics code MCNP, i.e. MCNP6. Three types of benchmarks were used, viz. criticality safety benchmarks, (fusion) shielding benchmarks, and reference systems for which the effective delayed neutron fraction is reported. For criticality safety, more than 2000 benchmarks from the International Handbook of Criticality Safety Benchmark Experiments were used. Benchmarks from all categories were used, ranging from low-enriched uranium, compound fuel, thermal spectrum ones (LEU-COMP-THERM), to mixed uranium-plutonium, metallic fuel, fast spectrum ones (MIX-MET-FAST). For fusion shielding many benchmarks were based on IAEA specifications for the Oktavian experiments (for Al, Co, Cr, Cu, LiF, Mn, Mo, Si, Ti, W, Zr), Fusion Neutronics Source in Japan (for Be, C, N, O, Fe, Pb), and Pulsed Sphere experiments at Lawrence Livermore National Laboratory (for 6Li, 7Li, Be, C, N, O, Mg, Al, Ti, Fe, Pb, D2O, H2O, concrete, polyethylene and teflon). The new functionality in MCNP6 to calculate the effective delayed neutron fraction was tested by comparison with more than thirty measurements in widely varying systems. Among these were measurements in the Tank Critical Assembly (TCA in Japan) and IPEN/MB-01 (Brazil), both with a thermal spectrum, two cores in Masurca (France) and three cores in the Fast Critical Assembly (FCA, Japan), all with fast spectra. The performance of the three libraries, in combination with MCNP6, is shown to be good. The results for the LEU-COMP-THERM category are on average very close to the benchmark value. Also for most other categories the results are satisfactory. Deviations from the benchmark values do occur in certain benchmark series, or in isolated cases within benchmark series. Such

  18. Characterization of complex carbide–silicide precipitates in a Ni–Cr–Mo–Fe–Si alloy modified by welding

    SciTech Connect

    Bhattacharyya, D. Davis, J.; Drew, M.; Harrison, R.P.; Edwards, L.

    2015-07-15

    Nickel based alloys of the type Hastelloy-N™ are ideal candidate materials for molten salt reactors, as well as for applications such as pressure vessels, due to their excellent resistance to creep, oxidation and corrosion. In this work, the authors have attempted to understand the effects of welding on the morphology, chemistry and crystal structure of the precipitates in the heat affected zone (HAZ) and the weld zone of a Ni–Cr–Mo–Fe–Si alloy similar to Hastelloy-N™ in composition, by using characterization techniques such as scanning and transmission electron microscopy. Two plates of a Ni–Cr–Mo–Fe–Si alloy GH-3535 were welded together using a TiG welding process without filler material to achieve a joint with a curved molten zone with dendritic structure. It is evident that the primary precipitates have melted in the HAZ and re-solidified in a eutectic-like morphology, with a chemistry and crystal structure only slightly different from the pre-existing precipitates, while the surrounding matrix grains remained unmelted, except for the zones immediately adjacent to the precipitates. In the molten zone, the primary precipitates were fully melted and dissolved in the matrix, and there was enrichment of Mo and Si in the dendrite boundaries after solidification, and re-precipitation of the complex carbides/silicides at some grain boundaries and triple points. The nature of the precipitates in the molten zone varied according to the local chemical composition. - Graphical abstract: Display Omitted - Highlights: • Ni-based alloy with Cr, Mo, Si, Fe and C was welded, examined with SEM, EBSD, and TEM. • Original Ni{sub 2}(Mo,Cr){sub 4}(Si,C) carbides changed from equiaxed to lamellar shape in HAZ. • Composition and crystal structure remained almost unchanged in HAZ. • Original carbides changed to lamellar Ni{sub 3}(Mo,Cr){sub 3}(Si,C) in some cases in weld metal. • Precipitates were mostly incoherent, but semi-coherent in some cases in weld

  19. First-principles calculation of defect free energies: General aspects illustrated in the case of bcc Fe

    NASA Astrophysics Data System (ADS)

    Murali, D.; Posselt, M.; Schiwarth, M.

    2015-08-01

    Modeling of nanostructure evolution in solids requires comprehensive data on the properties of defects such as the vacancy and foreign atoms. Since most processes occur at elevated temperatures, not only the energetics of defects in the ground state, but also their temperature-dependent free energies must be known. The first-principles calculation of contributions of phonon and electron excitations to free formation, binding, and migration energies of defects is illustrated in the case of bcc Fe. First of all, the ground-state properties of the vacancy, the foreign atoms Cu, Y, Ti, Cr, Mn, Ni, V, Mo, Si, Al, Co, O, and the O-vacancy pair are determined under constant volume (CV) as well as zero-pressure (ZP) conditions, and relations between the results of both kinds of calculations are discussed. Second, the phonon contribution to defect free energies is calculated within the harmonic approximation using the equilibrium atomic positions determined in the ground state under CV and ZP conditions. In most cases, the ZP-based free formation energy decreases monotonously with temperature, whereas for CV-based data both an increase and a decrease were found. The application of a quasiharmonic correction to the ZP-based data does not modify this picture significantly. However, the corrected data are valid under zero-pressure conditions at higher temperatures than in the framework of the purely harmonic approach. The difference between CV- and ZP-based data is mainly due to the volume change of the supercell since the relative arrangement of atoms in the environment of the defects is nearly identical in the two cases. A simple transformation similar to the quasiharmonic approach is found between the CV- and ZP-based frequencies. Therefore, it is not necessary to calculate these quantities and the corresponding defect free energies separately. In contrast to ground-state energetics, the CV- and ZP-based defect free energies do not become equal with increasing supercell

  20. Combinatorial Reactive Sputtering of In2S3 as an Alternative Contact Layer for Thin Film Solar Cells.

    PubMed

    Siol, Sebastian; Dhakal, Tara P; Gudavalli, Ganesh S; Rajbhandari, Pravakar P; DeHart, Clay; Baranowski, Lauryn L; Zakutayev, Andriy

    2016-06-01

    High-throughput computational and experimental techniques have been used in the past to accelerate the discovery of new promising solar cell materials. An important part of the development of novel thin film solar cell technologies, that is still considered a bottleneck for both theory and experiment, is the search for alternative interfacial contact (buffer) layers. The research and development of contact materials is difficult due to the inherent complexity that arises from its interactions at the interface with the absorber. A promising alternative to the commonly used CdS buffer layer in thin film solar cells that contain absorbers with lower electron affinity can be found in β-In2S3. However, the synthesis conditions for the sputter deposition of this material are not well-established. Here, In2S3 is investigated as a solar cell contact material utilizing a high-throughput combinatorial screening of the temperature-flux parameter space, followed by a number of spatially resolved characterization techniques. It is demonstrated that, by tuning the sulfur partial pressure, phase pure β-In2S3 could be deposited using a broad range of substrate temperatures between 500 °C and ambient temperature. Combinatorial photovoltaic device libraries with Al/ZnO/In2S3/Cu2ZnSnS4/Mo/SiO2 structure were built at optimal processing conditions to investigate the feasibility of the sputtered In2S3 buffer layers and of an accelerated optimization of the device structure. The performance of the resulting In2S3/Cu2ZnSnS4 photovoltaic devices is on par with CdS/Cu2ZnSnS4 reference solar cells with similar values for short circuit currents and open circuit voltages, despite the overall quite low efficiency of the devices (∼2%). Overall, these results demonstrate how a high-throughput experimental approach can be used to accelerate the development of contact materials and facilitate the optimization of thin film solar cell devices.

  1. Combinatorial Reactive Sputtering of In2S3 as an Alternative Contact Layer for Thin Film Solar Cells.

    PubMed

    Siol, Sebastian; Dhakal, Tara P; Gudavalli, Ganesh S; Rajbhandari, Pravakar P; DeHart, Clay; Baranowski, Lauryn L; Zakutayev, Andriy

    2016-06-01

    High-throughput computational and experimental techniques have been used in the past to accelerate the discovery of new promising solar cell materials. An important part of the development of novel thin film solar cell technologies, that is still considered a bottleneck for both theory and experiment, is the search for alternative interfacial contact (buffer) layers. The research and development of contact materials is difficult due to the inherent complexity that arises from its interactions at the interface with the absorber. A promising alternative to the commonly used CdS buffer layer in thin film solar cells that contain absorbers with lower electron affinity can be found in β-In2S3. However, the synthesis conditions for the sputter deposition of this material are not well-established. Here, In2S3 is investigated as a solar cell contact material utilizing a high-throughput combinatorial screening of the temperature-flux parameter space, followed by a number of spatially resolved characterization techniques. It is demonstrated that, by tuning the sulfur partial pressure, phase pure β-In2S3 could be deposited using a broad range of substrate temperatures between 500 °C and ambient temperature. Combinatorial photovoltaic device libraries with Al/ZnO/In2S3/Cu2ZnSnS4/Mo/SiO2 structure were built at optimal processing conditions to investigate the feasibility of the sputtered In2S3 buffer layers and of an accelerated optimization of the device structure. The performance of the resulting In2S3/Cu2ZnSnS4 photovoltaic devices is on par with CdS/Cu2ZnSnS4 reference solar cells with similar values for short circuit currents and open circuit voltages, despite the overall quite low efficiency of the devices (∼2%). Overall, these results demonstrate how a high-throughput experimental approach can be used to accelerate the development of contact materials and facilitate the optimization of thin film solar cell devices. PMID:27173477

  2. An investigation of oxide composite anode materials for lithium ion batteries

    NASA Astrophysics Data System (ADS)

    Liu, Bo

    This thesis is aimed to develop high-capacity, inexpensive, long cycle life and environmentally benign anode for lithium-ion batteries. With those goals in mind, a novel oxide alloy composite materials MO-Sn xCoyCz (MO=GeO2, SnO2, SiO and SiO2) have been proposed and investigated. Mechanical alloying method has been used to synthesize oxide alloy composite anode material. The MO-SnxCo yCz composite has the potential to combine the advantageous properties of both Sn-Co-C (long cycle life) and MO (high capacity) and, thereby, improve the overall electrochemical performance. The as-milled materials were studied by BET, laser particle analyzer, X-ray diffraction (XRD), scanning electron microscope (SEM), pair distribution function (PDF), extended X-ray absorption fine structure (EXAFS). Evaluating from electrochemical performance, tap density, and cost, GeO2 and SiO are the most promising candidates alloyed with Sn-Co-C system. The GeO 2 composite anode shows a reversible capacity over 800 mAh/g with good capacity retention. Furthermore, the 1st cycle coulombic efficiency has been improved up to 80%. Compared with GeO2, SiO has an advantage on the price. A series of composite anode materials of xSiO * (1-x)SnxCoyC z were studied by electrochemical method. The composition of 50 wt.%SiO-50 wt.%Sn30Co30C40 shows the best electrochemical performance. Two different milling methods (ultra high-energy milling and SPEX milling) were employed to prepare the samples. Ultra high-energy milling sample exhibited superior electrochemical performance. Stabilized lithium metallic powder technique is employed on this anode to improve the first cycle coulombic efficiency. Full-cell configuration (Li1.2Ni 0.15Co0.10Mn0.55O2 vs. 50 wt.%SiO-50 wt.% Sn30Co30C40) has been cycled over 200 cycles successfully. The SiO-SnxFeyC z (x : y: z molar ratio) composite has been milled in different compositions. Metallic iron was employed instead of cobalt, which cuts the cost significantly but does not

  3. In vitro evaluation of the cutaneous penetration of sprayable sunscreen emulsions with high concentrations of UV filters.

    PubMed

    Durand, L; Habran, N; Henschel, V; Amighi, K

    2009-08-01

    The aim of this study was to evaluate the possible penetration through human skin of organic and inorganic filters contained in sunscreen emulsions packaged in aerosol cans, using an in vitro method. Experiments were carried out on two different types of emulsion: W/Si and W/O. This study was conducted using static diffusion cells (Franz cells). The determination of organic UV filters [Methylene Bis Benzotriazolyl Tetramethylbutylphenol (MBBT); Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine (BEMT); Diethylamino Hydroxybenzoyl Hexyl Benzoate (DHHB); Ethylhexyl Methoxycinnamate (EMC); and 2-Ethylhexyl Dimethyl PABA (ED-PABA)] was performed by High Performance Liquid Chromatography (HPLC). Therefore, it was important to develop a single analytical method for the quantification of the five organic filters with the aim of facilitating the experiment. The determination of inorganic filters [titanium dioxide (TiO(2)) and zinc oxide (ZnO)] was performed using an emission spectrometric analysis method (ICP-OES). The HPLC and ICP-OES methods were validated. After a penetration test of 24 h duration, the results showed very low penetration only for two of the organic filters (maximum penetration of 1.21 microg cm(-2) h(-1) for EMC and 0.14 microg cm(-2) h(-1) for MBBT) and no penetration for the inorganic filters. Moreover, more than 50% of each sunscreen agent stayed on the surface on the skin. These results are consistent with those in the literature that presents similar experiments. This study showed that the sprayable sunscreen products developed, which contained high concentrations of UV filters, presented a low level of skin penetration.

  4. Development of a prototype nickel optic for the Constellation-X hard x-ray telescope

    NASA Astrophysics Data System (ADS)

    Romaine, Suzanne E.; Basso, Stefano; Bruni, Ricardo J.; Citterio, Oberto; Engelhaupt, Darell; Ghigo, Mauro; Gorenstein, Paul; Gubarev, Mikhail V.; Mazzoleni, Francesco; O'Dell, Stephen L.; Pareschi, Giovanni; Parodi, Giancarlo; Ramsey, Brian D.; Speegle, Chet O.

    2004-02-01

    The Constellation-X mission, planned for launch in 2013, will feature an array of hard-x-ray telescopes (HXT) with a total collecting area of greater than 1500 cm2 at 40 keV. Two technologies are currently being investigated for the optics of these telescopes including multilayer-coated Eletroformed-Nickel-Replicated (ENR) shells. The attraction of the ENR process is that the resulting full-shell optics are inherently stable and offer the prospect of better angular resolution which results in lower background and higher instrument sensitivity. The challenge for this process is to meet a relatively tight weight budget with a relatively dense material (ρnickel = 9 g/cm3.) To demonstrate the viability of the ENR process we are fabricating a prototype HXT mirror module to be tested against a competing segmented-glass-shell optic. The ENR prototype will consist of 5 shells of diameters from 150 mm to 280 mm with a length of 426 mm. To meet the stringent weight budget for Con-X, the shells will range in thickness from 100 microns to 150 microns. The innermost of these will be coated with Iridium, while the remainder will be coated with graded-dspaced W/Si multilayers. Mandrels for these shells are in the fabrication stage, the first test shells have been produced and are currently undergoing tests for figure and microroughness. A tentative date of June '04 has been set for the prototype X-ray testing at MSFC. Issues currently being addressed are the control of stresses in the multiplayer coating and ways of mitigating their effects on the figure of the necessarily thin shells. The fabrication, handling and mounting of these shells must be accomplished without inducing permanent figure distortions. A full status report on the prototype optic will be presented along with test results as available.

  5. 0.33-k1 ArF lithography for 100-nm DRAM

    NASA Astrophysics Data System (ADS)

    Bok, Cheol-Kyu; Kim, Seok-Kyun; Kim, Hee-Bom; Oh, Jin-Sung; Ahn, Chang-Nam; Shin, Ki-Soo

    2002-07-01

    We have evaluated 0.33k1 ArF lithography using 0.63NA scanner to develop 100 nm DRAM. ArF resist problems were resist pattern shrinkage during CD SEM measurement, resist pattern collapse during wet development and poor etch resistance. Off-Site Measurement (OSM) method has been developed for decreasing pattern shrinkage. With OSM method, 8nm of CD shrinkage was down to 2nm for 100nm L/S patterns. We have found a proper BARC material that prevents resist patterns falling down. Lack of etch resistance was compensated by hard mask. With W/SiN hard mask, acrylate- type resist patterns were transferred well into W/poly-Si gate patterns. We have simulated process window of critical DRAM cell patterns (isolation, gate, bit line contact, storage node) in the simple off-axis illumination (OAI) and optical proximity correction (OPC) conditions based on single exposure. Simulation results were verified by lithography tests and it turned out that 0.33k1 process was possible with exposure latitude of above 10% and focus latitude of more than 0.4 micrometers . 0.33k1 ArF lithography was successfully implemented into 100 nm DRAM with CD uniformity of 10nm (3 (sigma) ) and overlay accuracy of 30 nm (mean +3 (sigma) ). We have also evaluated double exposure technique using dipole illumination targeting 90 nm in order to see the possibility of 0.29k1 process. 0.29k1 process was also likely to be possible, although some specific improvements were recommended for the wider process window. From the simulation and resist patterning results, we believe that 0.85 NA lens will be able to extend ArF lithography into 75 nm by single exposure technology using crosspole illumination (0.33k1 process) and 65 nm by double exposure technology using dipole and crosspole illumination (0.29k1 process).

  6. Novel InGaAs contact layer growth for hetero-junction bipolar transistors (HBTs) by using the multiple group-V source molecular beam epitaxy (MBE) system

    NASA Astrophysics Data System (ADS)

    Kadoiwa, Kaoru; Izumi, Shigekazu; Yamamoto, Yoshitsugu; Hayafuji, Norio; Sonoda, Takuji

    1999-05-01

    Dependence of layer surface morphology and electrical properties on growth conditions, growth temperature and supplying conditions of group-V sources such as solid-As and AsH 3 hydride gas, has been investigated with specially designed MBE system, including both solid-As source cell and gas source cracking cell, for highly lattice-mismatched (+4%) In 0.5Ga 0.5As layer grown on GaAs. We demonstrate that utilizing of AsH 3 hydride source enables us to obtain a superior smooth surface in comparison with utilizing solid-As source. The HAZE level for the former source is reduced to one twentieth of the latter. The advantage of gas-source MBE (GS-MBE) method (hydrogen effect) was realized as suppressing In segregation. The effective hydrogen comes from AsH 3 hydride that acts as the surfactant that controls coherent small 3D islands formation during initial growth stage. The optimized GS-MBE growth method, under AsH 3 flow rate of 3 SCCM and growth temperature of 470°C, establishes that the In xGa 1- xAs ( x=0.6) layer grown on GaAs with the surface is as smooth as the surface of GaAs substrate, and also shows the contact resistance to be 4×10 -8 Ω cm 2. This value is well-fitted for nonalloy ohmic contact by using W/Si as emitter electrodes for HBTs.

  7. Chemical vapor deposition of ternary refractory nitrides for diffusion barrier applications

    SciTech Connect

    Smith, P.M.; Custer, J.S.; Fleming, J.G.; Roherty-Osmun, E.; Cohn, M.; Jones, R.V.

    1996-06-01

    As semiconductor device dimensions shrink, new diffusion barriers will be required. Amorphous refractory ternaries have been identified as promising barrier candidates; because sputtering may not be suitable, we have developed chemical vapor deposition processes for these materials. Acceptable deposition rates are found for each of these processes at 350 C, with all depositions performed between 300 and 450 C. The first process produces a range of Ti-Si-N compositions from Ti organometallic, SiH{sub 4}, and NH{sub 3}. Resistivity of the Ti-Si-N films changes with Si content from >1{Omega}-cm at 25 at.% Si down to that of TiN (200{mu}{Omega}-cm). Step coverage obtained is better than 80% on 0.5 {mu}m features with aspect ratios of >1.6. The second CVD process produces a range of W-Si-N film compositions from WF{sub 6}, Si{sub 2}H{sub 6}, and NH{sub 3}. Resistivities vary with composition from 350 to 20,000 {mu}{Omega}-cm. Step coverage obtained is 100% on reentrant 0.25 {mu}m features with aspect ratios of 4.0. The third process employs WF{sub 6}(reduced by SiH{sub 4}), B{sub 2}H{sub 6}, and NH{sub 3} to produce W-B-N films with a range of compositions. Resistivities range from 200 to 20,000 {mu}{Omega}-cm. Step coverage obtained is {approx}40% on 1.5 {mu}m features with aspect ratios of 5.5.

  8. Synthesis, structural and spectroscopic properties of acentric triple molybdate Cs{sub 2}NaBi(MoO{sub 4}){sub 3}

    SciTech Connect

    Savina, A.A.; Atuchin, V.V.; Solodovnikov, S.F.; Solodovnikova, Z.A.; Krylov, A.S.; Maximovskiy, E.A.; Molokeev, M.S.; Oreshonkov, A.S; Pugachev, A.M.; and others

    2015-05-15

    New ternary molybdate Cs{sub 2}NaBi(MoO{sub 4}){sub 3} is synthesized in the system Na{sub 2}MoO{sub 4}–Cs{sub 2}MoO{sub 4}–Bi{sub 2}(MoO{sub 4}){sub 3}. The structure of Cs{sub 2}NaBi(MoO{sub 4}){sub 3} of a new type is determined in noncentrosymmetric space group R3c, a=10.6435(2), c=40.9524(7) Å, V=4017.71(13) Å{sup 3}, Z=12 in anisotropic approximation for all atoms taking into account racemic twinning. The structure is completely ordered, Mo atoms are tetrahedrally coordinated, Bi(1) and Bi(2) atoms are in octahedra, and Na(1) and Na(2) atoms have a distorted trigonal prismatic coordination. The Cs(1) and Cs(2) atoms are in the framework cavities with coordination numbers 12 and 10, respectively. No phase transitions were found in Cs{sub 2}NaBi(MoO{sub 4}){sub 3} up to the melting point at 826 K. The compound shows an SHG signal, I{sub 2w}/I{sub 2w}(SiO{sub 2})=5 estimated by the powder method. The vibrational properties are evaluated by Raman spectroscopy, and 26 narrow lines are measured. - Graphical abstract: - Highlights: • The crystal structure of Cs{sub 2}NaBi(MoO{sub 4}){sub 3} is defined. • The molybdate Cs{sub 2}NaBi(MoO{sub 4}){sub 3} is stable up to melting point at 826 K. • Vibrational properties of Cs{sub 2}NaBi(MoO{sub 4}){sub 3} are evaluated by Raman spectroscopy.

  9. Applications of compact laser-driven EUV/XUV plasma sources

    NASA Astrophysics Data System (ADS)

    Barkusky, Frank; Bayer, Armin; Döring, Stefan; Flöter, Bernhard; Großmann, Peter; Peth, Christian; Reese, Michael; Mann, Klaus

    2009-05-01

    In recent years, technological developments in the area of extreme ultraviolet lithography (EUVL) have experienced great improvements. So far, intense light sources based on discharge or laser plasmas, beam steering and imaging optics as well as sensitive detectors are available. Currently, applications of EUV radiation apart from microlithography, such as metrology, high-resolution microscopy, or surface analysis come more and more into focus. In this contribution we present an overview on the EUV/XUV activities of the Laser-Laboratorium Göttingen based on table-top laser-produced plasma (LPP) sources. As target materials gaseous or liquid jets of noble gases or solid Gold are employed. Depending on the applications, the very clean but low intense gaseous targets are mainly used for metrology, whereas the targets for high brilliances (liquid, solid) are used for microscopy and direct structuring. For the determination of interaction mechanisms between EUV radiation and matter, currently the solid Gold target is used. In order to obtain a small focal spot resulting in high EUV fluence, a modified Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to this source. By demagnified (10x) imaging of the Au plasma an EUV spot of 3 μm diameter with a maximum energy density of ~1.3 J/cm2 is generated (pulse duration 8.8 ns). First applications of this integrated source and optics system reveal its potential for high-resolution modification and direct structuring of solid surfaces. For chemical analysis of various samples a NEXAFS setup was developed. It consists of a LPP, using gaseous Krypton as a broadband emitter in the water-window range, as well as a flat field spectrograph. The laboratory system is set to the XUV spectral range around the carbon K-edge (4.4 nm). The table-top setup allows measurements with spectral accuracy comparable to synchrotron experiments. NEXAFS-experiments in transmission and reflection are

  10. Determination of bioavailable macro- and microelements from agricultural soil using different extractants

    NASA Astrophysics Data System (ADS)

    Milićević, Tijana; Relić, Dubravka; Popović, Aleksandar

    2015-04-01

    Translocation of elements from soil to plant has a major impact on the growing plants and on their quality in any agricultural field. In this study, soil samples were collected from agricultural area Radmilovac, Serbia during grapevine season in 2013. Bioavailable elements from soil to plant (grapevine) were isolated by five different extractants: 0.11 mol L-1 CH3COOH, 0.05 mol L-1 Na-EDTA, 0.01 mol L-1 CaCl2, 1 mol L-1 NH4NO3 and distilled water during 2 and 16 h. Concentrations of 22 bioavailable macroelements: Al, Ca, Fe, K, Mg, Mn, Na, P, S, Si and microelements: B, Be, Cd, Co, Cr, Cu, Mo, Ni, Pb, Sb, V, Zn were determined by ICP-OES. The best extractant for Al, B, Be, Mg, Mo, Si and Zn was CH3COOH, Na-EDTA for Ca, Cd, Co, Cu, Fe, K, Mn, Ni, P, Pb, V, and distilled water for Na and S. Acetic acid has been proven to be an aggressive extractant and it can be used for isolation of higher concentrations of plant bioavailable elements from soil, rather than distilled water, CaCl2 and NH4NO3. The acidity of CH3COOH enhances the extraction of bioavailable fraction of microelements from various substrates and destruction of carbonates as well. However, it can be concluded that there is no unique extractant for isolation of the most bioavailable fraction for all elements from the soil. It can be noticed that the most common concentrations of macroelements, K and Mn, are in correlation with concentrations of microelements, Cd, Co, Ni and Zn. This indicates that the most of their concentrations in soils are followed by microelements, whose concentrations are much lower than concentrations of macroelements. However, as these correlations are the most common, it can be concluded that the pairs of macro- and microelements (e.g. Mn-Cd, Mn-Co, Ni-Cd, Ni-Co, Ni-Mn, Zn-Cd, Zn-Co, Zn-Mn, Zn-Ni) have the same source in soil and can be isolated by the same extractant. It is interesting to note that the concentrations of Ca and Mg extracted from soil using CH3COOH are in correlation

  11. Clean induced feature CD shift of EUV mask

    NASA Astrophysics Data System (ADS)

    Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

    2016-05-01

    EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when

  12. Benchmarking ENDF/B-VII.0

    NASA Astrophysics Data System (ADS)

    van der Marck, Steven C.

    2006-12-01

    The new major release VII.0 of the ENDF/B nuclear data library has been tested extensively using benchmark calculations. These were based upon MCNP-4C3 continuous-energy Monte Carlo neutronics simulations, together with nuclear data processed using the code NJOY. Three types of benchmarks were used, viz., criticality safety benchmarks, (fusion) shielding benchmarks, and reference systems for which the effective delayed neutron fraction is reported. For criticality safety, more than 700 benchmarks from the International Handbook of Criticality Safety Benchmark Experiments were used. Benchmarks from all categories were used, ranging from low-enriched uranium, compound fuel, thermal spectrum ones (LEU-COMP-THERM), to mixed uranium-plutonium, metallic fuel, fast spectrum ones (MIX-MET-FAST). For fusion shielding many benchmarks were based on IAEA specifications for the Oktavian experiments (for Al, Co, Cr, Cu, LiF, Mn, Mo, Si, Ti, W, Zr), Fusion Neutronics Source in Japan (for Be, C, N, O, Fe, Pb), and Pulsed Sphere experiments at Lawrence Livermore National Laboratory (for 6Li, 7Li, Be, C, N, O, Mg, Al, Ti, Fe, Pb, D 2O, H 2O, concrete, polyethylene and teflon). For testing delayed neutron data more than thirty measurements in widely varying systems were used. Among these were measurements in the Tank Critical Assembly (TCA in Japan) and IPEN/MB-01 (Brazil), both with a thermal spectrum, and two cores in Masurca (France) and three cores in the Fast Critical Assembly (FCA, Japan), all with fast spectra. In criticality safety, many benchmarks were chosen from the category with a thermal spectrum, low-enriched uranium, compound fuel (LEU-COMP-THERM), because this is typical of most current-day reactors, and because these benchmarks were previously underpredicted by as much as 0.5% by most nuclear data libraries (such as ENDF/B-VI.8, JEFF-3.0). The calculated results presented here show that this underprediction is no longer there for ENDF/B-VII.0. The average over 257

  13. Intrinsic SiO{sub x}-based unipolar resistive switching memory. II. Thermal effects on charge transport and characterization of multilevel programing

    SciTech Connect

    Chang, Yao-Feng Chen, Ying-Chen; Chen, Yen-Ting; Wang, Yanzhen; Xue, Fei; Zhou, Fei; Lee, Jack C.; Fowler, Burt

    2014-07-28

    Multilevel programing and charge transport characteristics of intrinsic SiO{sub x}-based resistive switching memory are investigated using TaN/SiO{sub x}/n{sup ++}Si (MIS) and TiW/SiO{sub x}/TiW (MIM) device structures. Current transport characteristics of high- and low-resistance states (HRS and LRS) are studied in both device structures during multilevel operation. Analysis of device thermal response demonstrates that the effective electron energy barrier is strongly dependent on the resistance of the programed state, with estimates of 0.1 eV in the LRS and 0.6 eV in the HRS. Linear data fitting and conductance analyses indicate Poole-Frenkel emission or hopping conductance in the low-voltage region, whereas Fowler-Nordheim (F-N) or trap-assisted tunneling (TAT) is indicated at moderate voltage. Characterizations using hopping transport lead to hopping distance estimates of ∼1 nm in the LRS for both device structures. Relative permittivity values (ε{sub r}) were extracted using the Poole-Frenkel formulism and estimates of local filament temperature, where ε{sub r} values were ∼80 in the LRS and ∼4 in the HRS, suggesting a strongly polarized medium in the LRS. The onset of F-N tunneling or TAT corresponds to an observed “overshoot” in the I-V response with an estimated threshold of 1.6 ± 0.2 V, in good agreement with reported electro-luminescence results for LRS devices. Resistive switching is discussed in terms of electrochemical reactions between common SiO{sub 2} defects, and specific defect energy levels are assigned to the dominant transitions in the I-V response. The overshoot response in the LRS is consistent with TAT through either the Eγ' oxygen vacancy or the hydrogen bridge defect, both of which are reported to have an effective bandgap of 1.7 eV. The SET threshold at ∼2.5 V is modeled as hydrogen release from the (Si-H){sub 2} defect to generate the hydrogen bridge, and the RESET transition is modeled as an

  14. Chemical Engineering Division fuel cycle programs. Quarterly progress report, April-June 1979. [Pyrochemical/dry processing; waste encapsulation in metal; transport in geologic media

    SciTech Connect

    Steindler, M.J.; Ader, M.; Barletta, R.E.

    1980-09-01

    For pyrochemical and dry processing materials development included exposure to molten metal and salt of Mo-0.5% Ti-0.07% Ti-0.01% C, Mo-30% W, SiC, Si/sub 2/ON/sub 2/, ZrB/sub 2/-SiC, MgAl/sub 2/O/sub 4/, Al/sub 2/O/sub 3/, AlN, HfB/sub 2/, Y/sub 2/O/sub 3/, BeO, Si/sub 3/N/sub 4/, nickel nitrate-infiltrated W, W-coated Mo, and W-metallized alumina-yttria. Work on Th-U salt transport processing included solubility of Th in liquid Cd, defining the Cd-Th and Cd-Mg-Th phase diagrams, ThO/sub 2/ reduction experiments, and electrolysis of CaO in molten salt. Work on pyrochemical processes and associated hardware for coprocessing U and Pu in spent FBR fuels included a second-generation computer model of the transport process, turntable transport process design, work on the U-Cu-Mg system, and U and Pu distribution coefficients between molten salt and metal. Refractory metal vessels are being service-life tested. The chloride volatility processing of Th-based fuel was evaluated for its proliferation resistance, and a preliminary ternary phase diagram for the Zn-U-Pu system was computed. Material characterization and process analysis were conducted on the Exportable Pyrochemical process (Pyro-Civex process). Literature data on oxidation of fissile metals to oxides were reviewed. Work was done on chemical bases for the reprocessing of actinide oxides in molten salts. Flowsheets are being developed for the processing of fuel in molten tin. Work on encapsulation of solidified radioactive waste in metal matrix included studies of leach rate of crystalline waste materials and of the impact resistance of metal-matrix waste forms. In work on the transport properties of nuclear waste in geologic media, adsorption of Sr on oolitic limestone was studied, as well as the migration of Cs in basalt. Fitting of data on the adsorption of iodate by hematite to a mathematical model was attempted.

  15. Reliability of materials in MEMS : residual stress and adhesion in a micro power generation system.

    SciTech Connect

    Moody, Neville Reid; Kennedy, Marian S.; Bahr, David F.

    2007-09-01

    The reliability of thin film systems is important to the continued development of microelectronic and micro-electro-mechanical systems (MEMS). The reliability of these systems is often tied to the ability of the films to remain adhered to its substrate. By measuring the amount of energy to separate the film from the substrate, researchers can predicts film lifetimes. Recent work has resulted in several different testing techniques to measure this energy including spontaneous buckling, indentation induced delamination and four point bending. This report focuses on developing quantifiable adhesion measurements for multiple thin film systems used in MEMS and other thin film systems of interest to Sandia programs. First, methods of accurately assessing interfacial toughness using stressed overlayer methods are demonstrated using both the W/Si and Au/Si systems. For systems where fracture only occurs along the interface, such as Au/Si, the calculated fracture energies between different tests are identical if the energy put into the system is kept near the needed strain energy to cause delamination. When the energy in the system is greater than needed to cause delamination, calculated adhesion energies can increase by a factor of three due to plastic deformation. Dependence of calculated adhesion energies on applied energy in the system was also shown when comparisons of four point bending and stressed overlayer test methods were completed on Pt/Si systems. The fracture energies of Pt/Ti/SiO{sub 2} were studied using four-point bending and compressive overlayers. Varying the thickness of the Ti film from 2 to 17 nm in a Pt/Ti/SiO{sub 2} system, both test methods showed an increase of adhesion energy until the nominal Ti thickness was 12nm. Then the adhesion energy began to decrease. While the trends in toughness are similar, the magnitude of the toughness values measured between the test methods is not the same, demonstrating the difficulty in extracting mode I toughness

  16. The investigation of nanoscale effects on schottky interfaces and the scattering rates of high resistivity metals

    NASA Astrophysics Data System (ADS)

    Durcan, Christopher

    Understanding the transport of electrons through materials and across interfaces is fundamental to modern day electronics. As electrons travel, interactions with defects within the crystal lattice induce scattering which gives rise to resistivity. At the interface between two materials, electrostatic barriers exist which can impede the flow of electrons. The work of this thesis is to further the understanding of electron transport by measuring the transport across metal-semiconductor interfaces at the nanoscale and measure scattering phenomena in metals. The measurement technique ballistic electron emission microscopy (BEEM) was used due to its ability to probe the scattering processes within a metal film and across metal semiconductor interfaces with nanoscale resolution. It was discovered that the hot electron transmission of the W/Si(001) Schottky barrier decreases over a period of 21 days with the initial Schottky barrier height of 0.71eV decreasing to 0.62eV. The spatial map changes dramatically from 98% of the spectra able to be fit to only 27%. This is supported by transmission electron microscopy (TEM) showing the formation of a tungsten silicide which increases in thickness. It was discovered that the deposition of tungsten on silicon using electron beam evaporation and RF magnetron sputtering resulted in dramatic differences in the Schottky barrier height and transport of hot electrons. A difference of ˜70meV was measured in the Schottky barrier height's for both p-type and n-type silicon. Spatial maps show a uniform barrier height for the sputter film and varying barrier height for the e-beam film. Histograms show a symmetric gaussian profile for the sputtered film and an asymmetric profile for the evaporated film, arising from an increase in elastic scattering. The hot electron attenuation length of tungsten and chromium thin films were measured on Si(001) and Si(111) substrates. An attenuation length of 2.26nm was measured at 1.0V bias for tungsten

  17. Laboratory Method for Evaluating the Characteristics of Expansion Rock Bolts Subjected to Axial Tension / Laboratoryjna Metoda Badania Charakterystyk Kotew Rozprężnych Poddanych Rozciąganiu Osiowemu

    NASA Astrophysics Data System (ADS)

    Korzeniowski, Waldemar; Skrzypkowski, Krzysztof; Herezy, Łukasz

    2015-03-01

    stanowiska badawczego. Pomiar siły na stanowisku laboratoryjnym był wykonywany za pomocą czterech tensometrycznych czujników siły. Czujniki były rozmieszczone co 90 stopni na tarczy pomiarowej (Rys. 4). Całkowita siła rejestrowana podczas badań rozciągania żerdzi kotwowej była sumą wartości sił uzyskiwanych na poszczególnych czujnikach siły. Pomiar przemieszczeń elementów obudowy oraz wydłużenia żerdzi kotwowej był wykonywany za pomocą enkodera linkowego inkrementalnego. Enkoder przymocowany był na stałe do bloku siłowników (Rys. 6), natomiast linka enkodera przemieszczała się wraz z wysuwem tarczy pomiarowej (Rys. 6). W celu określenia odkształcenia materiału badanego elementu (żerdzi kotwowej) w badaniach zastosowano tensometry elektrooporowe typu kratowego (Rys. 7). Czujniki siły, przemieszczenia oraz odkształcenia zostały podłączone do uniwersalnego wzmacniacza pomiarowego QuantumX MX840, za pomocą wtyczek 15-pinowych. Podczas procesu rozciągania kotwy wyniki pomiarów siły, przemieszczenia oraz odkształcenia były rejestrowane na bieżąco za pomocą specjalistycznego programu z dziedziny technik pomiarowych "CATMAN - EASY". Wybór programu wynikał z możliwości współpracy z systemem operacyjnym MS Windows oraz połączenia komputera z uniwersalnym wzmacniaczem pomiarowym QuantumX MX840 poprzez kabel ethernetowy. Program umożliwiał bieżącą (on- -line) wizualizację i ocenę pomiaru. Ponadto po zakończeniu testu, tworzone były raporty dokumentujące wyniki pomiarów, które były zapisywane w rozszerzeniu pliku ASCII. Następnie dane były przesyłane do programu Microsoft Excel w celu analizy uzyskanych wyników. W badaniach zastosowano obudowę kotwową rozprężną, zainstalowaną w bloku symulującym górotwór o wytrzymałości skał na ściskanie wynoszącej 80MPa (Rys. 3), która była obciążana statycznie według ustalonego programu obciążenia uwzględniającego utrzymywanie zadanej osiowej siły rozci

  18. Proceedings of the Eleventh International Conference on Calorimetry in Particle Physics

    NASA Astrophysics Data System (ADS)

    Cecchi, Claudia

    primitive generation / N. Regnault -- Optical data links for the CMS ECAL / J. Grahl (contribution not received) -- CMS ECAL off-detector electronics / R. Alemany Fernandez -- Performance of a low noise readout ASIC for the W-Si calorimeter physics prototype for the future linear collider / C. de la Taille -- Properties of a sampling calorimeter with warm-liquid ionization chambers / S. Plewnia -- Calorimetry and the DO experiment / R. Zitoun (contribution not received) -- Data quality monitoring for the DØ calorimeter / V. Shary -- Status of the construction of the ATLAS electromagnetic liquid argon calorimeter, overview of beam test performance studies / L. Serin -- Uniformity of response of ATLAS liquid argon EM calorimeter / O. Gaunter -- Status of the ATLAS liquid argon hadronic endcap calorimeter construction / M. Vincter -- Results from particle beam tests of the ATLAS liquid argon endcap calorimeters / M. Lefebvre -- First results of the DREAM project / R. Wigmans -- Electron and muon detection with a dual-readout (DREAM) calorimeter / N. Akchurin -- The neutron zero degree calorimeter for the ALICE experiment / M. Gallio -- The liquid xenon scintillation calorimeter of the MEG experiment: operation of a large prototype / G. Signorelli -- Detection of high energy particles using radio frequency signals / C. Hebert -- Hadronic shower simulation / J.-P. Wellisch -- E.M. and hadronic shower simulation with FLUKA / G. Battistoni -- Simulation of the LHCb electromagnetic calorimeter response with GEANT4 / P. Robbe -- Comparison of beam test results of the combined ATLAS liquid argon endcap calorimeters with GEANT3 and GEANT4 simulations / D. Salihagić -- GEANT4 hadronic physics validation with LHC test-beam data / C. Alexa -- The full simulation of the GLAST LAT high energy gamma ray telescope / F. Longo -- Response of the KLOE electromagnetic calorimeter to low-energy particles / T. Spadaro -- Calorimeter algorithms for DØ; / S. Trincaz-Duvoid -- Identification of

  19. Why should we pay more for layout designers?

    NASA Astrophysics Data System (ADS)

    Khan, Samee U.

    2003-12-01

    ,G2j^2,....,Gmj^2 6. Compute I, (Mij) in each Gij^2 7. Compute Si=si(u)|u belongs to Mij 8. Find the minimum index i such that w(Si)<= w(D) 9. Return Sj 10. Compute G'=min Mij belongs V [max si sum{i=0}^{|Sj|] 11. Return G' Theorem 2 The PNL algorithm is complete and will identify a solution, if there exists one. Proof (Trivial and not included due to space) Theorem 3 The PNL algorithm has a lower bound of 4-approximation to the optimal algorithm. Proof (Not included due to space, but the basic argument, is due to the fact that picking a node v with 2-epsilon in G^2, would required the neighbors to be picked in G^4, thus the PNL is no better than 4-epsilon, where epsilon >0) Experiments We made some initial experiments, which are showing promissing results with savings in fiber, equipment cost, due to space, and inital phase of the experiments, we are not including the results here. P.S. My appologies for exceeding the text limit. There is much more detail to the formal proof, I hope the idea is still conveyed. There are also 2 figures which will be faxed.