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Sample records for modified laser etching

  1. Chemical etching mechanism and properties of microstructures in sapphire modified by femtosecond laser

    NASA Astrophysics Data System (ADS)

    Liu, Manyu; Hu, Youwang; Sun, Xiaoyan; Wang, Cong; Zhou, Jianying; Dong, Xinran; Yin, Kai; Chu, Dongkai; Duan, Ji'an

    2017-01-01

    Sapphire, with extremely high hardness, high-temperature stability and wear resistance, often corroded in molten KOH at 300 °C after processing. The fabrication of microstructures on sapphire substrate performed by femtosecond laser irradiation combined with KOH solution chemical etching at room temperature is presented. It is found that this method reduces the harsh requirements of sapphire corrosion. After femtosecond irradiation, the sapphire has a high corrosion speed at room temperature. Through the analysis of Raman spectrum and XRD spectrum, a novel insight of femtosecond laser interaction with sapphire (α-Al2O3) is proposed. Results indicated that grooves on sapphire surface were formed by the lasers ablation removal, and the groove surface was modified in a certain depth. The modified area of the groove surface was changed from α-Al2O3 to γ-Al2O3. In addition, the impacts of three experimental parameters, laser power, scanning velocities and etching time, on the width and depth of microstructures are investigated, respectively. The modified area dimension is about 2 μm within limits power and speed. This work could fabricate high-quality arbitrary microstructures and enhance the performance of sapphire processing.

  2. Excimer Laser Etching

    SciTech Connect

    Boatner, Lynn A; Longmire, Hu Foster; Rouleau, Christopher M; Gray, Allison S

    2008-04-01

    Excimer laser radiation at a wavelength of = 248 nm represents a new etching method for the preparation of metallographic specimens. The method is shown to be particularly effective for enhancing the contrast between different phases in a multiphase metallographic specimen.

  3. Laser-driven fusion etching process

    DOEpatents

    Ashby, Carol I. H.; Brannon, Paul J.; Gerardo, James B.

    1989-01-01

    The surfaces of solid ionic substrates are etched by a radiation-driven chemical reaction. The process involves exposing an ionic substrate coated with a layer of a reactant material on its surface to radiation, e.g. a laser, to induce localized melting of the substrate which results in the occurrance of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic salt substrates, e.g., a solid inorganic salt such as LiNbO.sub.3, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.

  4. Laser-driven fusion etching process

    DOEpatents

    Ashby, C.I.H.; Brannon, P.J.; Gerardo, J.B.

    1987-08-25

    The surfaces of solids are etched by a radiation-driven chemical reaction. The process involves exposing a substrate coated with a layer of a reactant material on its surface to radiation, e.g., a laser, to induce localized melting of the substrate which results in the occurrence of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic substrates, e.g., LiNbO/sub 3/, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.

  5. Biomechanical evaluation of laser-etched Ti implant surfaces vs. chemically modified SLA Ti implant surfaces: Removal torque and resonance frequency analysis in rabbit tibias.

    PubMed

    Lee, Jung-Tae; Cho, Sung-Am

    2016-08-01

    To compare osseointegration and implant stability of two types of laser-etched (LE) Ti implants with a chemically-modified, sandblasted, large-grit and acid-etched (SLA) Ti implant (SLActive(®), Straumann, Basel, Switzerland), by evaluating removal torque and resonance frequency between the implant surface and rabbit tibia bones. We used conventional LE Ti implants (conventional LE implant, CSM implant, Daegu, Korea) and LE Ti implants that had been chemically activated with 0.9% NaCl solution (LE active implant) for comparison with SLActive(®) implants Two types of 3.3×8mm laser-etched Ti implants - conventional LE implants and LE active implants were prepared. LE implants and SLActive(®) implants were installed on the left and right tibias of 10 adult rabbits weighing approximately 3.0kg LE active implants and SLActive(®) implants were installed on the left and right tibias of 11 adult rabbits. After installation, we measured insertion torque (ITQ) and resonance frequency (ISQ). Three weeks (LE active) or 4 weeks (conventional LE) after installation, we measured removal torque (RTQ) and ISQ. In the conventional LE experiment, the mean ITQ was 16.99±6.35Ncm for conventional LE implants and 16.11±7.36Ncm for SLActive(®) implants (p=0.778>0.05). After 4 weeks, the mean of RTQ was 39.49±17.3Ncm for LE and 42.27±20.5Ncm for SLActive(®) (p=0.747>0.05). Right after insertion of the implants, the mean ISQ was 74.8±4.98 for conventional LE and 70.1±9.15 for SLActive(®) implants (p=0.169>0.05). After 4 weeks, the mean ISQ was 64.40±6.95 for LE and 67.70±9.83 for SLActive(®) (p=0.397>0.05). In the LE active experiment, the mean ITQ was 16.24±7.49Ncm for LE active implants and 14.33±5.06Ncm for SLActive(®) implants (p=0.491>0.05). After 3 weeks, the mean RTQ was 39.25±16.41Ncm for LE active and 41.56±10.41Ncm for SLActive(®) implants (p=0.698>0.05). Right after insertion of the implants, the mean ISQ was 58.64±10.51 for LE active implants and 53.82

  6. Study of Thermal Electrical Modified Etching for Glass and Its Application in Structure Etching.

    PubMed

    Zhan, Zhan; Li, Wei; Yu, Lingke; Wang, Lingyun; Sun, Daoheng

    2017-02-10

    In this work, an accelerating etching method for glass named thermal electrical modified etching (TEM etching) is investigated. Based on the identification of the effect in anodic bonding, a novel method for glass structure micromachining is proposed using TEM etching. To validate the method, TEM-etched glasses are prepared and their morphology is tested, revealing the feasibility of the new method for micro/nano structure micromachining. Furthermore, two kinds of edge effect in the TEM and etching processes are analyzed. Additionally, a parameter study of TEM etching involving transferred charge, applied pressure, and etching roughness is conducted to evaluate this method. The study shows that TEM etching is a promising manufacture method for glass with low process temperature, three-dimensional self-control ability, and low equipment requirement.

  7. Study of Thermal Electrical Modified Etching for Glass and Its Application in Structure Etching

    PubMed Central

    Zhan, Zhan; Li, Wei; Yu, Lingke; Wang, Lingyun; Sun, Daoheng

    2017-01-01

    In this work, an accelerating etching method for glass named thermal electrical modified etching (TEM etching) is investigated. Based on the identification of the effect in anodic bonding, a novel method for glass structure micromachining is proposed using TEM etching. To validate the method, TEM-etched glasses are prepared and their morphology is tested, revealing the feasibility of the new method for micro/nano structure micromachining. Furthermore, two kinds of edge effect in the TEM and etching processes are analyzed. Additionally, a parameter study of TEM etching involving transferred charge, applied pressure, and etching roughness is conducted to evaluate this method. The study shows that TEM etching is a promising manufacture method for glass with low process temperature, three-dimensional self-control ability, and low equipment requirement. PMID:28772521

  8. Comparison of alkaline phosphatase activity of MC3T3-E1 cells cultured on different Ti surfaces: modified sandblasted with large grit and acid-etched (MSLA), laser-treated, and laser and acid-treated Ti surfaces.

    PubMed

    Li, Lin-Jie; Kim, So-Nam; Cho, Sung-Am

    2016-06-01

    In this study, the aim of this study was to evaluate the effect of implant surface treatment on cell differentiation of osteoblast cells. For this purpose, three surfaces were compared: (1) a modified SLA (MSLA: sand-blasted with large grit, acid-etched, and immersed in 0.9% NaCl), (2) a laser treatment (LT: laser treatment) titanium surface and (3) a laser and acid-treated (LAT: laser treatment, acid-etched) titanium surface. The MSLA surfaces were considered as the control group, and LT and LAT surfaces as test groups. Alkaline phosphatase expression (ALP) was used to quantify osteoblastic differentiation of MC3T3-E1 cell. Surface roughness was evaluated by a contact profilometer (URFPAK-SV; Mitutoyo, Kawasaki, Japan) and characterized by two parameters: mean roughness (Ra) and maximum peak-to-valley height (Rt). Scanning electron microscope revealed that MSLA (control group) surface was not as rough as LT, LAT surface (test groups). Alkaline phosphatase expression, the measure of osteoblastic differentiation, and total ALP expression by surface-adherent cells were found to be highest at 21 days for all three surfaces tested (P<.05). Furthermore, ALP expression levels of MSLA and LAT surfaces were significantly higher than expression levels of LT surface-adherent cells at 7, 14, and 21 days, respectively (P<.05). However, ALP expression levels between MSLA and LAT surface were equal at 7, 14, and 21 days (P>.05). This study suggested that MSLA and LAT surfaces exhibited more favorable environment for osteoblast differentiation when compared with LT surface, the results that are important for implant surface modification studies.

  9. Comparison of alkaline phosphatase activity of MC3T3-E1 cells cultured on different Ti surfaces: modified sandblasted with large grit and acid-etched (MSLA), laser-treated, and laser and acid-treated Ti surfaces

    PubMed Central

    Li, Lin-Jie; Kim, So-Nam

    2016-01-01

    PURPOSE In this study, the aim of this study was to evaluate the effect of implant surface treatment on cell differentiation of osteoblast cells. For this purpose, three surfaces were compared: (1) a modified SLA (MSLA: sand-blasted with large grit, acid-etched, and immersed in 0.9% NaCl), (2) a laser treatment (LT: laser treatment) titanium surface and (3) a laser and acid-treated (LAT: laser treatment, acid-etched) titanium surface. MATERIALS AND METHODS The MSLA surfaces were considered as the control group, and LT and LAT surfaces as test groups. Alkaline phosphatase expression (ALP) was used to quantify osteoblastic differentiation of MC3T3-E1 cell. Surface roughness was evaluated by a contact profilometer (URFPAK-SV; Mitutoyo, Kawasaki, Japan) and characterized by two parameters: mean roughness (Ra) and maximum peak-to-valley height (Rt). RESULTS Scanning electron microscope revealed that MSLA (control group) surface was not as rough as LT, LAT surface (test groups). Alkaline phosphatase expression, the measure of osteoblastic differentiation, and total ALP expression by surface-adherent cells were found to be highest at 21 days for all three surfaces tested (P<.05). Furthermore, ALP expression levels of MSLA and LAT surfaces were significantly higher than expression levels of LT surface-adherent cells at 7, 14, and 21 days, respectively (P<.05). However, ALP expression levels between MSLA and LAT surface were equal at 7, 14, and 21 days (P>.05). CONCLUSION This study suggested that MSLA and LAT surfaces exhibited more favorable environment for osteoblast differentiation when compared with LT surface, the results that are important for implant surface modification studies. PMID:27350860

  10. Chemical Etch Effects on Laser-Induced Surface Damage Growth in Fused Silica

    SciTech Connect

    Hrubesh, L W; Norton, M A; Molander, W A; Wegner, P J; Staggs, M; Demos, S G; Britten, J A; Summers, L J; Lindsey, E F; Kozlowski, M R

    2000-12-22

    We investigated chemical etching as a possible means to mitigate the growth of UV laser-induced surface damage on fused silica. The intent of this work is to examine the growth behavior of existing damage sites that have been processed to remove the UV absorbing, thermo-chemically modified material within the affected area. The study involved chemical etching of laser-induced surface damage sites on fused silica substrates, characterizing the etched sites using scanning electron microscopy (SEM) and laser fluorescence, and testing the growth behavior of the etched sites upon illumination with multiple pulses of 351nm laser light. The results show that damage sites that have been etched to depths greater than about 9 {micro}m have about a 40% chance for zero growth with 1000 shots at fluences of 6.8-9.4 J/cm{sup 2}. For the etched sites that grow, the growth rates are consistent with those for non-etched sites. There is a weak dependence of the total fluorescence emission with the etch depth of a site, but the total fluorescence intensity from an etched site is not well correlated with the propensity of the site to grow. Deep wet etching shows some promise for mitigating damage growth in fused silica, but fluorescence does not seem to be a good indicator of successful mitigation.

  11. Laser etching: A new technology to identify Florida grapefruit

    USDA-ARS?s Scientific Manuscript database

    Laser labeling of fruits and vegetables is an alternative means to label produce. Low energy CO2 laser beam etches the surface showing the contrasting underlying layer. These etched surfaces can promote water loss and potentially allowing for pathogen entry. The long term effects of laser labeling o...

  12. The influence of laser-induced surface modifications on the backside etching process

    NASA Astrophysics Data System (ADS)

    Zimmer, K.; Böhme, R.; Ruthe, D.; Rauschenbach, B.

    2007-05-01

    Spectroscopic measurements in the UV/VIS region show reduced transmission through laser-induced backside wet etching (LIBWE) of fused silica. Absorption coefficients of up to 10 5 cm -1 were calculated from the transmission measurements for a solid surface layer of about 50 nm. The temperatures near the interface caused by laser pulse absorption, which were analytically calculated using a new thermal model considering interface and liquid volume absorption, can reach 10 4 K at typical laser fluences. The high absorption coefficients and the extreme temperatures give evidence for an ablation-like process that is involved in the LIBWE process causing the etching of the modified near-surface region. The confinement of the ablation/etching process to the modified near-surface material region can account for the low etch rates observed in comparison to front-side ablation.

  13. Wet etching fabrication of photonic quantum ring laser

    NASA Astrophysics Data System (ADS)

    Kim, Moojin; Kim, Dongkwon; Lee, Seongeun; Kwon, O'Dae

    2004-11-01

    We present a wet etching process to fabricate good vertical mesa structures that result in high quality (Q) factors up to 2×104, important for smooth sidewall cavities such as the photonic quantum ring (PQR) laser. Q factor analyses also indicate that it can be improved much more once the internal scattering from the wafer materials is minimized. We use an etching solution of H3PO4:CH3OH:H2O2 with a volume ratio of 3:1:1, and a single-layer photoresist etch mask for etching GaAs /AlGaAs structures of the PQR laser several micrometer deep. As the etching temperature is varied from 20to40°C, the etched surface roughness decreases from 4.690to0.703nm according to scanning electron microscope and atomic force microscopy studies. From the activation energy analysis for the above etching process and the temperature dependence, the etching process is shown to be reaction limited. The PQR lasers with an active diameter of 10μm, fabricated by the wet etching process, show the spectral linewidth of 0.04nm. Three-dimensional Rayleigh-Fabry-Perot mode spectra for the PQR laser are also reported for the angle-resolved emission modes.

  14. In vitro evaluation of microleakage under orthodontic brackets using two different laser etching, self etching and acid etching methods.

    PubMed

    Hamamci, Nihal; Akkurt, Atilim; Başaran, Güvenç

    2010-11-01

    This study evaluated the microleakage of brackets bonded by four different enamel etching techniques. Forty freshly extracted human premolars were divided randomly into four equal groups and received the following treatment: group 1, acid etching; group 2, self-etching primer (SEP); group 3, erbium:yttrium-aluminum-garnet (Er:YAG) laser etching; and group 4, erbium, chromium:yttrium-scandium-gallium-garnet (Er,Cr:YSGG) laser etching. After photopolymerization, the teeth were kept in distilled water for 1 month and then subjected to 500 thermal cycles. Then, the specimens were sealed with nail varnish, stained with 0.5% basic fuchsin for 24 h, sectioned, and examined under a stereomicroscope. In addition, they were scored for marginal microleakage at the adhesive-enamel and bracket-adhesive interfaces from the incisal and gingival margins. Statistical analyses consisted of the Kruskal-Wallis test and the Mann-Whitney U test with Bonferroni correction. Microleakage occurred between the adhesive-enamel and bracket-adhesive interfaces in all groups. For the adhesive-enamel surface, a significant difference was observed between group 1 and groups 2 (P = 0.011), 3 (P = 0.002), and 4 (P = 0.000) on the gingival side. Overall, significant differences were observed between group 1 and groups 3 (P = 0.003) and 4 (P = 0.000). In dental bonding procedures, acid etching was found to result in the least microleakage. Since etching with a laser decreases the risk of caries and is time-saving, it may serve as an alternative to acid etching.

  15. Nanostructured porous silicon by laser assisted electrochemical etching

    NASA Astrophysics Data System (ADS)

    Li, J.; Lu, C.; Hu, X. K.; Yang, Xiujuan; Loboda, A. V.; Lipson, R. H.

    2009-08-01

    Nanostructured porous silicon (pSi) was fabricated by combining electrochemical etching with 355 nm laser processing. pSi prepared in this way proves to be an excellent substrate for desorption/ionization on silicon (DIOS) mass spectrometry (MS). Surfaces prepared by electrochemical etching and laser irradiation exhibit strong quantum confinement as evidenced by the observation of a red shift in the Si Raman band at ~520-500 cm-1. The height of the nanostructured columns produced by electrochemical etching and laser processing is on the order of microns compared with tens of nanometers obtained without laser irradiation. The threshold for laser desorption and ionization of 12 mJ/cm2 using the pSi substrates prepared in this work is lower than that obtained for conventional matrix assisted laser desorption ionization (MALDI)-MS using a standard matrix compound such as [alpha]-cyano-4-hydroxycinnamic acid (CHCA; 30 mJ/cm2). Furthermore, the substrates prepared by etching and laser irradiation appear to resist laser damage better than those prepared by etching alone. These results enhance the capability of pSi for the detection of small molecular weight analytes by DIOS-MS.

  16. High performance surface-emitting lasers with dry etched facets

    NASA Astrophysics Data System (ADS)

    Ou, S. S.; Jansen, M.; Yang, J. J.; Sergant, M.; Mawst, L. J.; Botez, D.; Roth, T. J.; Hess, C.; Tu, C.

    1992-12-01

    The fabrication, performance characteristics, and applications of monolithic in-plane surface-emitting lasers (IPSELs) with dry-etched 45-degree micromirrors are reviewed. Several types of such laser diode structures in both junction-up and junction-down configurations are considered. The performance goals for IPSELs with 45-degree micromirrors are high power and efficiency, high duty cycle and CW operation, good reliability, and high fabrication yields. The proposed approach for achieving these goals includes uniform quantum well material growth and dry etching of the laser micromirrors with tight fabrication tolerances.

  17. Experimental study of 248nm excimer laser etching of alumina

    NASA Astrophysics Data System (ADS)

    Hu, Hongtao; Shao, Jingzhen; Wang, Xi; Fang, Xiaodong

    2016-10-01

    The 248 nm excimer laser etching characteristic of alumina ceramic and sapphire had been studied using different laser fluence and different number of pulses. And the interaction mechanism of 248 nm excimer laser with alumina ceramic and sapphire had been analyzed. The results showed that when the laser fluence was less than 8 J/cm2, the etching depth of alumina ceramic and sapphire were increased with the increase of laser fluence and number of pulses. At the high number pulses and high-energy, the surface of the sapphire had no obvious melting phenomenon, and the alumina ceramic appeared obvious melting phenomenon. The interaction mechanism of excimer laser with alumina ceramics and sapphire was mainly two-photon absorption. But because of the existence of impurities and defects, the coupling between the laser radiation and ceramic and sapphire was strong, and the thermal evaporation mechanism was also obvious.

  18. Femtosecond laser etching of dental enamel for bracket bonding.

    PubMed

    Kabas, Ayse Sena; Ersoy, Tansu; Gülsoy, Murat; Akturk, Selcuk

    2013-09-01

    The aim is to investigate femtosecond laser ablation as an alternative method for enamel etching used before bonding orthodontic brackets. A focused laser beam is scanned over enamel within the area of bonding in a saw tooth pattern with a varying number of lines. After patterning, ceramic brackets are bonded and bonding quality of the proposed technique is measured by a universal testing machine. The results are compared to the conventional acid etching method. Results show that bonding strength is a function of laser average power and the density of the ablated lines. Intrapulpal temperature changes are also recorded and observed minimal effects are observed. Enamel surface of the samples is investigated microscopically and no signs of damage or cracking are observed. In conclusion, femtosecond laser exposure on enamel surface yields controllable patterns that provide efficient bonding strength with less removal of dental tissue than conventional acid-etching technique.

  19. In Vitro Evaluation of Microleakage Around Orthodontic Brackets Using Laser Etching and Acid Etching Methods

    PubMed Central

    Toodehzaeim, Mohammad Hossein; Yassaei, Sogra; Karandish, Maryam; Farzaneh, Sedigeh

    2014-01-01

    Objective: path of microleakage between the enamel and adhesive potentially allows microbial ingress that may consequently cause enamel decalcification. The aim of this study was to compare microleakage of brackets bonded either by laser or acid etching techniques. Materials and Method: The specimens were 33 extracted premolars that were divided into three groups as the acid etching group (group 1), laser etching with Er:YAG at 100 mJ and 15 Hz for 15s (group 2), and laser etching with Er:YAG at 140 mJ and 15 Hz for 15s (group 3). After photo polymerization, the teeth were subjected to 500 thermal cycles. Then the specimens were sealed with nail varnish, stained with 2% methylen blue for 24hs, sectioned, and examined under a stereomicroscope. They were scored for marginal microleakage that occurred between the adhesive-enamel and bracket-adhesive interfaces from the occlusal and gingival margins. Data were analyzed with the Kruskal- Wallis test. Results: For the adhesive-enamel and bracket-adhesive surfaces, significant differences were not observed between the three groups. Conclusion: According to this study, the Er:YAG laser with 1.5 and 2.1 watt settings may be used as an adjunctive for preparing the surface for orthodontic bracket bonding. PMID:25628661

  20. CO2 laser ablative etching of polyethylene terephthalate

    NASA Astrophysics Data System (ADS)

    Dyer, P. E.; Oldershaw, G. A.; Sidhu, J.

    1989-06-01

    Films of polyethylene terephthalate (PET) can be successfully etched with 9 μm radiation from a pulsed TEA CO2 laser. The relationship between etch depth and fluence is broadly similar to that observed for excimer laser etching but with a less well-defined threshold. Time-resolved photoacoustic measurements of stress waves generated in the interaction show that at a fluence of 1.8 J cm-2 ablation occurs 100 200 ns after the start of the laser pulse, a time which is consistent with the rate of thermal decomposition of PET. The volatile products of ablation are carbon monoxide, carbon dioxide, methane, ethyne, ethene, benzene, ethanal, and small quantities of other products. For fluences close to and appreciably above the threshold the ablated material consists predominantly of involatile species of relatively high molecular weight, whereas at higher fluences substantial fragmentation of the polymer to small molecules occurs.

  1. Investigation of acid-etched CO2 laser ablated enamel surfaces using polarization sensitive optical coherence tomography

    NASA Astrophysics Data System (ADS)

    Nahm, Byung J.; Kang, Hobin; Chan, Kenneth; Fried, Daniel

    2012-01-01

    A carbon dioxide laser operating at the highly absorbed wavelength of 9.3μm with a pulse duration of 10-15μs is ideally suited for caries removal and caries prevention. The enamel thermally modified by the laser has enhanced resistance to acid dissolution. This is an obvious advantage for caries prevention; however, it is often necessary to etch the enamel surface to increase adhesion to composite restorative materials and such surfaces may be more resistant to etching. The purpose of the study was to non-destructively measure the susceptibility of laser-ablated enamel surfaces to acid dissolution before and after acid-etching using Polarization Sensitive Optical Coherence Tomography (PS-OCT). PS-OCT was used to acquire images of bovine enamel surfaces after exposure to laser irradiation at ablative fluence, acid-etching, and a surface softened dissolution model. The integrated reflectivity from lesion and the lesion depth were measured using PS-OCT. Samples were also sectioned for examination by Polarized Light Microscopy (PLM). PS-OCT images showed that acid-etching greatly accelerated the formation of subsurface lesions on both laser-irradiated and non-irradiated surfaces (P<0.05). A 37.5% phosphoric acid etch removed the laser modified enamel layer after 5-10 seconds.

  2. Laser micro-etching of metal prostheses for personal identification.

    PubMed

    Ganapathy, Dhanraj; Sivaswamy, Vinay; Sekhar, Prathap

    2017-01-01

    Denture marking techniques play a vital role in establishing personal identification in suitable clinical and forensic situations. The denture marking techniques are categorized broadly into additive and ablative methods. Additive methods involve embedding or impregnation of markers for establishing personal identity. Ablative methods involve partial removal of the denture surface thereby providing a marking for identification. Engraving and etching methods are the commonly used ablative methods. Ablative methods can be of contact and noncontact subtypes. Laser micro-etching is a precise noncontact ablative denture marking technique that could be used for prostheses-guided personal identification.

  3. The effect of dynamic etching on surface quality and laser damage resistance for fused silica optics

    NASA Astrophysics Data System (ADS)

    Wang, Zhiqiang; Yan, Hongwei; Yuan, Xiaodong; Li, Yuan; Yang, Ke; Yan, Lianghong; Zhang, Lijuan; Liu, Taixiang; Li, Heyang

    2017-05-01

    Fused silica optics were treated by dynamic etching using buffered hydrofluoric acid (BHF) with different etching depths. The transmissivity of fused silica slightly increases in deep UV (DUV) range after dynamic etching. Surface qualities of fused silica were characterized in terms of surface roughness, surface profile and photoluminescence (PL) spectra. The results show that dynamic etching has a slight impact on surface RMS roughness.PL defects gradually reduces by dynamic etching, and laser damage resistance of fused silica continuously increases with etching depth extending. When removal depth increases to 12μm, the damage threshold is the double that of the unetched surface. However, surface profile continuously deteriorates with etching depth increasing. Appropriate etching amount is very important for improving damage resistance and mitigating surface profile deteriorating of fused silica during etching process simultaneously. The study is expected to contribute to the practical application of dynamic etching for mitigating laser induced degradation of fused silica optics under UV laser irradiation.

  4. 21 CFR 179.43 - Carbon dioxide laser for etching food.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... 21 Food and Drugs 3 2014-04-01 2014-04-01 false Carbon dioxide laser for etching food. 179.43... § 179.43 Carbon dioxide laser for etching food. Carbon dioxide laser light may be safely used for... consists of a carbon dioxide laser designed to emit pulsed infrared radiation with a wavelength of 10.6...

  5. LEAN: laser-etched aqua number

    NASA Astrophysics Data System (ADS)

    Schell, Karel J.

    1998-04-01

    A security device on a banknote has to be recognized immediately by the general public and has to enable the general public to establish the genuineness of the banknote. This is the so-called first line of defense. Recently the development of the ability to establish the genuiness has gained momentum and is called 'self authenticating.' Comparing the banknote number with a 'watermark number' can do authenticating. The watermark number is engraved by a laser beam in the paper and is -- as the printed number -- different for each note. Recent progress in the material processing by laser enables the engraving of the individual watermark number for each banknote in line with the production process.

  6. Influence of etching time on bond strength in dentin irradiated with erbium lasers.

    PubMed

    Ferreira, Leila Soares; Apel, Christian; Francci, Carlos; Simoes, Alyne; Eduardo, Carlos P; Gutknecht, Norbert

    2010-11-01

    The purpose of this in vitro study was to evaluate the effect of etching time on the tensile bond strength (TBS) of a conventional adhesive bonded to dentin previously irradiated with erbium:yttrium-aluminum-garnet (Er:YAG) and erbium, chromium:yttrium-scandium-gallium-garnet (Er,Cr:YSGG) lasers. Buccal and lingual surfaces of 45 third molars were flattened until the dentin was exposed and randomly assigned to three groups (n = 30) according to the dentin treatment: control (not irradiated), irradiated with Er:YAG (1 W; 250 mJ; 4 Hz; 80.6 J/cm(2)) laser or Er,Cr:YSGG (4 W; 200 mJ; 20 Hz; 71.4 J/cm(2)) laser, and into three subgroups (n = 10) according to acid etching time (15 s, 30 s or 60 s) for each experimental group. After acid etching, the adhesive was applied, followed by the construction of an inverted cone of composite resin. The samples were immersed in distilled water (37 degrees C for 24 h) and subjected to TBS test [50 kilogram-force (kgf), 0.5 mm/min]. Data were analyzed by analysis of variance (ANOVA) and Tukey statistical tests (P < or = 0.05). Control group samples presented significant higher TBS values than those of all lased groups. Both irradiated groups exhibited similar TBS values. Samples subjected to the different etching times in each experimental group presented similar TBS. Based on the conditions of this in vitro study we concluded that Er:YAG and Er,Cr:YSGG laser irradiation of the dentin weakens the bond strength of the adhesive. Moreover, increased etching time is not able to modify the bonding strength of the adhesive to irradiated dentin.

  7. Towards optical quality micro-optic fabrication by direct laser writing and chemical etching

    NASA Astrophysics Data System (ADS)

    Ross, Calum; MacLachlan, David G.; Choudhury, Debaditya; Thomson, Robert R.

    2017-02-01

    Here we demonstrate the use of an advanced microfabrication technique, known as ultrafast laser inscription (ULI) with chemical etching, optimised for the fabrication of micro-optic systems in fused silica. ULI is a precision laser micromachining tool which relies on the high peak intensities associated with focused femtosecond pulses of light to locally modify the structure of a dielectric material. One manifestation of this modification is that the etch-rate of the modified regions can be increased by up to two orders of magnitude compared to that of pristine material, depending on the specific ULI parameters and the chemical etchant used. This capability means that ULI facilitates the repeatable fabrication of three-dimensional freeform structures in glass with micrometre resolution. Firstly, we present the results of investigations aimed at optimising the fabrication process and show that by controlling the laser polarisation during inscription, an etch-rate selectivity of 100 and a fivefold decrease in surface roughness can be achieved. We then demonstrate the characterisation of a microlens fabricated with optimum inscription parameters, including measurements of the lens surface profile, surface roughness and throughput, before demonstrating that the local surface roughness can be further decreased to below 5 nanometres by post-manufacture flame polishing.

  8. Diode Laser Measurements in an Inductively Coupled GEC Cell for Oxide Etching

    NASA Astrophysics Data System (ADS)

    Perry, Lee; Deering, Glen; Koltunski, Laure; Anderson, Harold

    1998-10-01

    Diode laser absorption measurements have been made on CF, CF2 and CO radicals in an inductively coupled GEC reference cell. The GEC reference cell was modified with a quartz confinement ring around the source region to stabilize the plasma. Optical emission and Langmuir probe studies indicated this modification resulted in fluorocarbon discharges with a plasma chemistry similar to that found in commercial etch tools. The experiments in this study focused on radical concentrations found in the reactor under typical high-density plasma etching conditions. In a 10 mTorr C_2F6 discharge at 300 W source power and 100 W bias power, etching proceeded at about 5000 Åmin-1. A range of source power and bias power conditions, from 100 to 400 W and from 0 to 130 W, respectively, was employed. The time evolution of CF, CF2 and CO in a C_2F6 plasma was monitored during an approximate 2 minute etch cycle. Chamber cleanliness and bias was found to exert a strong influence on radical densities. The data is expected to provide an important database for models of oxide etching in inductively coupled plasma tools. (This work has been supported by SEMATECH)

  9. Reactive Ion Etched Unstable and Stable Semiconductor Lasers

    NASA Astrophysics Data System (ADS)

    Biellak, Stephen Alexander

    1995-01-01

    High power, diffraction-limited semiconductor laser diodes are desirable for numerous applications such as efficient solid state laser pumping, nonlinear frequency conversion, and free-space communication. In the past several years, wide-stripe diode lasers and laser arrays with powers of up to several watts have become commercially available, but the beam quality of these devices is generally poor due to filamentation, a nonlinear material effect that aberrates the output beam profile. An attractive alternative to these simple Fabry-Perot lasers is offered by unstable resonators, which have inherently large gain volumes and a cavity geometry that inhibits filamentation. Prototype unstable resonators with dry-etched cavity mirrors have recently been demonstrated to achieve near diffraction -limited operation at moderately high output powers. However, the lateral mode properties of unstable resonators have heretofore not been examined in detail, nor has a reliable, high-throughput mirror etch process been developed for these devices. In this work, we have developed a GaAs RIE etching technique using common process equipment that yields mirrors with RMS surface roughness of 3 to 5 nm. We have fabricated unstable resonators and have measured lateral M ^2 beam quality values as low as 1.25 at 300 mW single facet output power in high magnification devices. The impact of cavity geometry and processing techniques on device performance was studied, and the optimal parameters for high-brightness applications were determined. Nearly concentric stable-resonator diode lasers were also fabricated for the first time using this etching technique. These stable-resonators were observed to operate in lateral modes determined primarily by the physical resonator structure up to several times threshold, after which nonlinear effects dominated the cavity modes. Based on these measurements, a description of stable device behavior in terms of gain saturation was developed. Finally, a

  10. Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching

    NASA Astrophysics Data System (ADS)

    Kang, JoonHyun; Lee, Song-ee; Park, Joon-Suh; Kim, Young-Hwan; Han, Il Ki

    2017-09-01

    The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O2 and vacuum conditions. By activating the O2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325 nm resulted in high etch rates whereas a long wavelength such as 532 nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O2 molecules in etching.

  11. 21 CFR 179.43 - Carbon dioxide laser for etching food.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... 21 Food and Drugs 3 2013-04-01 2013-04-01 false Carbon dioxide laser for etching food. 179.43... FOOD Radiation and Radiation Sources § 179.43 Carbon dioxide laser for etching food. Carbon dioxide... conditions: (a) The radiation source consists of a carbon dioxide laser designed to emit pulsed infrared...

  12. Aluminum thin film enhanced IR nanosecond laser-induced frontside etching of transparent materials

    NASA Astrophysics Data System (ADS)

    Nieto, Daniel; Cambronero, Ferran; Flores-Arias, María Teresa; Farid, Nazar; O'Connor, Gerard M.

    2017-01-01

    Laser processing of glass is of significant commercial interest for microfabrication of precision optical engineering devices. In this work, a laser ablation enhancement mechanism for microstructuring of glass materials is presented. The method consists of depositing a thin film of aluminum on the front surface of the glass material to be etched. The laser beam modifies the glass material by being incident on this front-side. The influence of ablation fluence in the nanosecond regime, in combination with the deposition of the aluminum layer of various thicknesses, is investigated by determining the ablation threshold for different glass materials including soda-lime, borosilicate, fused silica and sapphire. Experiments are performed using single laser pulse per shot in an air environment. The best enhancement in terms of threshold fluence reduction is obtained for a 16 nm thick aluminum layer where a reduction of two orders of magnitude in the ablation threshold fluence is observed for all the glass samples investigated in this work.

  13. Laser etching of quartz and teflon with 157 nm and 193 nm laser radiation

    NASA Astrophysics Data System (ADS)

    Herman, Peter R.; Chen, Boyi; Moore, J. David

    1993-10-01

    Laser etching rates are presented for Teflon and quartz at 193 nm and 157 nm wavelengths. The shorter 157 nm wavelength yields high-quality surfaces with etching thresholds at low fluences of 57 and 470 mJ/cm2, respectively, affording features well-suited to micromachining applications in the electronics and photonics industries. At 193 nm, etching profiles are severely degraded. A computer model was developed to model the ablation, swelling, incubation, and plume absorption processes observed in Teflon under 193 nm irradiation. The computer results satisfactorily represent the experimental data over a large fluence range of 0.6 to 13 J/cm2 with four adjustable parameters.

  14. Influence of erbium, chromium-doped: Yttrium scandium-gallium-garnet laser etching and traditional etching systems on depth of resin penetration in enamel: A confocal laser scanning electron microscope study

    PubMed Central

    Vijayan, Vishal; Rajasigamani, K.; Karthik, K.; Maroli, Sasidharan; Chakkarayan, Jitesh; Haris, Mohamed

    2015-01-01

    Objective: This study was performed to assess the resin tag length penetration in enamel surface after bonding of brackets to identify which system was most efficient. Methodology: Our study was based on a more robust confocal microscopy for visualizing the resin tags in enamel. Totally, 100 extracted human first and second premolars have been selected for this study and were randomly divided into ten groups of 10 teeth each. In Group 1, the buccal enamel surface was etched with 37% phosphoric acid (3M ESPE), Group 2 with 37% phosphoric (Ultradent). In Groups 5, 6, and 7, erbium, chromium-doped: Yttrium scandium-gallium-garnet (Er, Cr: YSGG) laser (Biolase) was used for etching the using following specifications: Group 5 (1.5 W/20 Hz, 15 s), Group 6 (2 W/10 Hz, 15 s), and Group 7 (2 W/20 Hz, 15 s). In Groups 8, 9, and 10, Er, Cr: YSGG laser (Biolase) using same specifications and additional to this step, conventional etching on the buccal enamel surface was etched with 37% (3M ESPE) after laser etching. In Groups 1, 5, 6, 7, 8, 9, and 10 3M Unitek Transbond XT primer was mixed with Rhodamine B dye (Sigma-Aldrich, Germany) to etched surface and then cured for 20 s. In Group 2, Ultradents bonding agent was mixed with Rhodamine B. In Group 3, 3M Unitek Transbond PLUS, Monrovia, USA, which was mixed with Rhodamine B dye (Sigma-Aldrich, Germany). Group 4, with self-etching primer (Ultradent-Peak SE, USA) was mixed with Rhodamine B dye (Sigma-Aldrich, Germany). Later (3M Unitek, Transbond XT, Monrovia USA) [Figure 1] was used to bond the modified Begg brackets (T. P. Orthodontics) in Groups 1, 3, 5, 6, 7, 8, 9, and 10. In Groups 2, 4 Ultradent-Peak LC Bond was used to bond the modified brackets. After curing brackets were debonded, and enamel depth penetration was assessed using confocal laser scanning microscope. Results: Group J had a mean maximum depth of penetration of 100.876 μm, and Group D was the least having a maximum value of 44.254 μm. Conclusions: Laser

  15. High precision laser induced etching of multilayered MoS{sub 2}

    SciTech Connect

    Ko, P. J.; Thu, T. V.; Takahashi, H.; Abderrahmane, A.; Takamura, T.; Sandhu, A.

    2014-02-20

    We demonstrate a method for reducing the thickness of multilayered MoS{sub 2} to few and single layers by irradiation with a 532 nm wavelength laser spot. The morphology and optical properites of the etched MoS{sub 2} were were measured by atomic force microscopy (AFM) and Raman spectroscopy before and after laser etching. Our laser etching method is a simple and highly effective tool for the fabrication of single, and few layered MoS{sub 2} for atomic scale optical and electronic device applications.

  16. Waterjet and laser etching: the nonlinear inverse problem

    PubMed Central

    Bilbao-Guillerna, A.; Axinte, D. A.; Cadot, G. B. J.

    2017-01-01

    In waterjet and laser milling, material is removed from a solid surface in a succession of layers to create a new shape, in a depth-controlled manner. The inverse problem consists of defining the control parameters, in particular, the two-dimensional beam path, to arrive at a prescribed freeform surface. Waterjet milling (WJM) and pulsed laser ablation (PLA) are studied in this paper, since a generic nonlinear material removal model is appropriate for both of these processes. The inverse problem is usually solved for this kind of process by simply controlling dwell time in proportion to the required depth of milling at a sequence of pixels on the surface. However, this approach is only valid when shallow surfaces are etched, since it does not take into account either the footprint of the beam or its overlapping on successive passes. A discrete adjoint algorithm is proposed in this paper to improve the solution. Nonlinear effects and non-straight passes are included in the optimization, while the calculation of the Jacobian matrix does not require large computation times. Several tests are performed to validate the proposed method and the results show that tracking error is reduced typically by a factor of two in comparison to the pixel-by-pixel approach and the classical raster path strategy with straight passes. The tracking error can be as low as 2–5% and 1–2% for WJM and PLA, respectively, depending on the complexity of the target surface. PMID:28791132

  17. Waterjet and laser etching: the nonlinear inverse problem

    NASA Astrophysics Data System (ADS)

    Bilbao-Guillerna, A.; Axinte, D. A.; Billingham, J.; Cadot, G. B. J.

    2017-07-01

    In waterjet and laser milling, material is removed from a solid surface in a succession of layers to create a new shape, in a depth-controlled manner. The inverse problem consists of defining the control parameters, in particular, the two-dimensional beam path, to arrive at a prescribed freeform surface. Waterjet milling (WJM) and pulsed laser ablation (PLA) are studied in this paper, since a generic nonlinear material removal model is appropriate for both of these processes. The inverse problem is usually solved for this kind of process by simply controlling dwell time in proportion to the required depth of milling at a sequence of pixels on the surface. However, this approach is only valid when shallow surfaces are etched, since it does not take into account either the footprint of the beam or its overlapping on successive passes. A discrete adjoint algorithm is proposed in this paper to improve the solution. Nonlinear effects and non-straight passes are included in the optimization, while the calculation of the Jacobian matrix does not require large computation times. Several tests are performed to validate the proposed method and the results show that tracking error is reduced typically by a factor of two in comparison to the pixel-by-pixel approach and the classical raster path strategy with straight passes. The tracking error can be as low as 2-5% and 1-2% for WJM and PLA, respectively, depending on the complexity of the target surface.

  18. A Comparison of Shear Bond Strengths of Metal and Ceramic Brackets using Conventional Acid Etching Technique and Er:YAG Laser Etching

    PubMed Central

    Yassaei, Sogra; Fekrazad, Reza; Shahraki, Neda; Goldani Moghadam, Mahdjoube

    2014-01-01

    Background and aims. The aim of this study was to compare shear bond strength (SBS) of metal and ceramic brackets bonded to enamel using acid versus Er:YAG laser etching. Materials and methods. Eighty premolars were divided into 4 groups: AM (acid etching/ metal brackets), AC (acid etching/ ceramic brackets), LM (laser etching/ metal brackets) and LC (laser etching/ ceramic brackets). Enamel condition-ing was done using acid in AC and AM and Er:YAG laser in LC and LM. Brackets were debonded with a Dartec machine and the SBSs were determined. Adhesive remnant index was evaluated under a stereomicroscope. Two additional teeth were conditioned with acid and laser for scanning electron microscopy examination. Comparisons of SBS value were done by ANOVA test. Results. statistical analyses showed that SBSs of acid groups were significantly higher than that of laser groups, but dif-ferences between SBS values of AC/ AM and LC/LM were not significant. SEM examination revealed different etching pattern. Conclusion. Low power Er:YAG laser etching offers clinically acceptable SBS which besides its other superiorities to acid etching can be an appropriate alternative for bonding of ceramic brackets. PMID:25024836

  19. Release etch modeling analysis and the use of laser scanning microscopy for etch time prediction of micromachined structures

    NASA Astrophysics Data System (ADS)

    Matamis, George; Gogoi, Bishnu P.; Monk, David J.; McNeil, Andrew; Burrows, Veronica A.

    2000-08-01

    An alternative non-destructive analysis method using laser scanning microscopy (LSM) was used to study etch release distances in MEMS pressure sensor. The LSM method eliminates samples preparation and is easy to implement in a MEMS manufacturing environment. In this study, various diaphragm structures were etched using a highly concentrated HF based solution. Experimental etch data were obtained for both SiO2 and PSG films under these various structures. Both the height and the width of the sacrificial layer port/channel had a significant effect on etch rate for both films. As expected, a non-linear etch rate was obtained for both SiO2 and PSG films. Since the HF concentration changes over time in a manufacturing bath process, careful selection of processing time is required in order to fully release MEMS structures. Future theoretical modeling with the assistance of experimental data obtained in this study is being pursued to strengthen past work done by Eaton et al, Monk et al, and Liu et al.

  20. Laser chemical etching of waveguides and quasi-optical devices

    NASA Astrophysics Data System (ADS)

    Drouet D'Aubigny, Christian Yann Pierre

    2003-11-01

    The terahertz (THz) frequency domain, located at the frontier of radio and light, is the last unexplored region of the electromagnetic spectrum. As technology becomes available, THz systems are finding applications to fields ranging all the way from astronomical and atmospheric remote sensing to space telecommunications, medical imaging, and security. In Astronomy the THz and far infrared (IR) portion of the electromagnetic spectrum (λ = 300 to 10 μm) may hold the answers to countless questions regarding the origin and evolution of the Universe, galaxy, star and planet formation. Over the past decade, advances in telescope and detector technology have for the first time made this regime available to astronomers. Near THz frequencies, metallic hollow waveguide structures become so small, (typically much less than a millimeter), that conventional machining becomes extremely difficult, and in many cases, nearly impossible. Laser induced, micro-chemical etching is a promising new technology that can be used to fabricate three dimensional structures many millimeters across with micrometer accuracy. Laser micromachining of silicon possesses a significant edge over more conventional techniques. It does not require the use of masks and is not confined to crystal planes. A non-contact process, it eliminates tool wear and vibration problems associated with classical milling machines. At the University of Arizona we have constructed the first such laser micromachining system optimized for the fabrication of THz and far IR waveguide and quasi-optical components. The system can machine structures up to 50 mm in diameter, down to a few microns accuracy in a few minutes and with a remarkable surface finish. A variety of THz devices have been fabricated using this technique, their design, fabrication, assembly and theoretical performance is described in the chapters that follow.

  1. Etching of fused silica and glass with excimer laser at 351 nm

    NASA Astrophysics Data System (ADS)

    Zimmer, K.; Braun, A.; Böhme, R.

    2003-03-01

    The etching of solid surfaces at the interface to liquids is a new promising method for micro-machining of transparent materials. To extend the method to additional materials the pulsed radiation of a XeF-excimer laser (351 nm) was used for etching different types of glass (Corning Inc.: Pyrex, 7059 and Schott Group: D263, AF45) and fused silica for comparison. The etch rates of the investigated materials increase almost linear at low laser fluences. Threshold fluences for glass as low as 0.5 J/cm 2 and etch rates from 6 to 10 nm per pulse at 1 J/cm 2 have been determined. The etch rate and the threshold fluence depend also on the used liquid, consisting of a solvent (acetone, toluene) and a certain concentration of dissolved pyrene, but only little on the glass type. Due to the low etch rate typically very smooth surfaces are achieved. The surface roughness measured by AFM on Corning 7059-glass at an etch depth of 3.7 μm is as low as 4 nm. Contrary to the other glasses the surface roughness of Pyrex is much higher and dominated by typical arbitrary etch pits with micron dimensions. Comparing the etching of fused silica at a wavelength of 248 and 351 nm the used solution influences both the etch threshold and the etch rate. In accordance to earlier investigations at 248 nm also XeF-laser etching at the interface to an absorbing liquid results in a good surface quality, well defined patterns and almost no debris deposition. Thus, this technique is a good candidate for precise micro-machining applications.

  2. Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface

    NASA Astrophysics Data System (ADS)

    Nichkalo, Stepan; Druzhinin, Anatoly; Evtukh, Anatoliy; Bratus', Oleg; Steblova, Olga

    2017-02-01

    This work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification allowed to obtain the close-packed Au nanodrop (ND) pattern that generates the nanowires (NWs) and the well-separated Au NDs, which induce the nanopore (NP) formation. The antireflective properties of these structures in comparison with NWs produced by the conventional Ag-MacEtch method were analysed. The total surface reflectance of 1 7% for SiNWs and 17% for SiNPs was observed over the entire Si-absorbing region. Moreover, SiNWs prepared by Au-MacEtch demonstrate better antireflective properties in contrast to those formed by conventional Ag-assisted chemical etching. So, the use of SiNWs produced by the modified Au-MacEtch method as the antireflective material is favored over those prepared by Ag-MacEtch due to their higher light absorption and lower reflectance. The possible reason of these findings is discussed.

  3. Modified TMAH based etchant for improved etching characteristics on Si{1 0 0} wafer

    NASA Astrophysics Data System (ADS)

    Swarnalatha, V.; Narasimha Rao, A. V.; Ashok, A.; Singh, S. S.; Pal, P.

    2017-08-01

    Wet bulk micromachining is a popular technique for the fabrication of microstructures in research labs as well as in industry. However, increasing the throughput still remains an active area of research, and can be done by increasing the etching rate. Moreover, the release time of a freestanding structure can be reduced if the undercutting rate at convex corners can be improved. In this paper, we investigate a non-conventional etchant in the form of NH2OH added in 5 wt% tetramethylammonium hydroxide (TMAH) to determine its etching characteristics. Our analysis is focused on a Si{1 0 0} wafer as this is the most widely used in the fabrication of planer devices (e.g. complementary metal oxide semiconductors) and microelectromechanical systems (e.g. inertial sensors). We perform a systematic and parametric analysis with concentrations of NH2OH varying from 5% to 20% in step of 5%, all in 5 wt% TMAH, to obtain the optimum concentration for achieving improved etching characteristics including higher etch rate, undercutting at convex corners, and smooth etched surface morphology. Average surface roughness (R a), etch depth, and undercutting length are measured using a 3D scanning laser microscope. Surface morphology of the etched Si{1 0 0} surface is examined using a scanning electron microscope. Our investigation has revealed a two-fold increment in the etch rate of a {1 0 0} surface with the addition of NH2OH in the TMAH solution. Additionally, the incorporation of NH2OH significantly improves the etched surface morphology and the undercutting at convex corners, which is highly desirable for the quick release of microstructures from the substrate. The results presented in this paper are extremely useful for engineering applications and will open a new direction of research for scientists in both academic and industrial laboratories.

  4. Enamel resistance to demineralization following Er:YAG laser etching for bonding orthodontic brackets

    PubMed Central

    Ahrari, Farzaneh; Poosti, Maryam; Motahari, Pourya

    2012-01-01

    Background: Several studies have shown that laser-etching of enamel for bonding orthodontic brackets could be an appropriate alternative for acid conditioning, since a potential advantage of laser could or might be caries prevention. This study compared enamel resistance to demineralization following etching with acid phosphoric or Er:YAG laser for bonding orthodontic brackets. Materials and Methods: Fifty sound human premolars were divided into two equal groups. In the first group, enamel was etched with 37% phosphoric acid for 15 seconds. In the second group, Er:YAG laser (wavelength, 2 940 nm; 300 mJ/pulse, 10 pulses per second, 10 seconds) was used for tooth conditioning. The teeth were subjected to 4-day PH-cycling process to induce caries-like lesions. The teeth were then sectioned and the surface area of the lesion was calculated in each microphotographs and expressed in pixel. The total surface of each specimen was 196 608 pixels. Results: Mean lesion areas were 7 171 and 7532 pixels for Laser-etched and Acid-etched groups, respectively. The two sample t-test showed that there was no significant difference in lesion area between the two groups (P = 0.914). Conclusion: Although Er:YAG laser seems promising for etching enamel before bonding orthodontic brackets, it does not reduce enamel demineralization when exposed to acid challenge. PMID:23162591

  5. Modeling the Losses of Dissolved CO(2) from Laser-Etched Champagne Glasses.

    PubMed

    Liger-Belair, Gérard

    2016-04-21

    Under standard champagne tasting conditions, the complex interplay between the level of dissolved CO2 found in champagne, its temperature, the glass shape, and the bubbling rate definitely impacts champagne tasting by modifying the neuro-physicochemical mechanisms responsible for aroma release and flavor perception. On the basis of theoretical principles combining heterogeneous bubble nucleation, ascending bubble dynamics, and mass transfer equations, a global model is proposed, depending on various parameters of both the wine and the glass itself, which quantitatively provides the progressive losses of dissolved CO2 from laser-etched champagne glasses. The question of champagne temperature was closely examined, and its role on the modeled losses of dissolved CO2 was corroborated by a set of experimental data.

  6. Polygonal pits on silicon surfaces that are created by laser-assisted chemical etching

    NASA Astrophysics Data System (ADS)

    Saito, Mitsunori; Kimura, Saori

    2017-02-01

    Laser-assisted chemical etching was conducted for creating periodic textures on silicon surfaces. Silicon plates with the (111) surface orientation were immersed in an aqueous solution of potassium hydroxide, and a pulsed laser beam (532 nm wavelength, 5 ns duration, 10 pulse/s) was irradiated on their surface to promote anisotropic etching. The laser beam was patterned by using a glass capillary plate that contained a hexagonal array of micropores (10 μ m diameter, 12 m period). The focused beam projected the hexagonal image on the silicon surface, creating bright spots of 4 μ m period. During the laser irradiation process of 3 min, both laser-induced ablation and chemical etching took place at these bright spots. After stop of laser irradiation, the chemical etching progressed further, and consequently, a periodic array of triangular or hexagonal pits emerged on the silicon surface. The direction of the triangular pits changed by rotation of the silicon plate. When a silicon plate with the (100) surface orientation was used, diamond or rectangular pits were created on its surface. The mechanism of this polygonal texturing was explained by using the normal and intersecting vectors of the (100), (110), and (111) planes that exhibited different etching rates.

  7. Evaluation of shear bond strength of orthodontic brackets bonded with Er-YAG laser etching

    PubMed Central

    Raji, S. Hamid; Birang, Reza; Majdzade, Fateme; Ghorbanipour, Reza

    2012-01-01

    Background: Based on contradictory findings concerning the use of lasers for enamel etching, the purpose of this study was to investigate the shear bond strength of teeth prepared for bonding with Er-YAG laser etching and compare them with phosphoric acid etching. Materials and Methods: In this in vitro study forty – eight premolars, extracted for orthodontic purposes were randomly divided in to three groups. Thirty-two teeth were exposed to laser energy for 25 s: 16 teeth at 100 mj setting and 16 teeth at 150 mj setting. Sixteen teeth were etched with 37% phosphoric acid. The shear bond strength of bonded brackets with the Transbond XT adhesive system was measured with the Zwick testing machine. Descriptive statistics, Kolmogorov–Smirnov test, of homogeneity of variances, one- way analysis of variances and Tukey's test and Kruskal Wallis were used to analyze the data. Results: The mean shear bond strength of the teeth lased with 150 mj was 12.26 ± 4.76 MPa, which was not significantly different from the group with acid etching (15.26 ± 4.16 MPa). Irradiation with 100 mj resulted in mean bond strengths of 9.05 ± 3.16 MPa, which was significantly different from that of acid etching (P < 0.001). Conclusions: laser etching at 150 and 100 mj was adequate for bond strength but the failure pattern of brackets bonded with laser etching is dominantly at adhesive – enamel interface and is not safe for enamel during debonding. PMID:23087733

  8. Five-year clinical evaluation of 300 teeth restored with porcelain laminate veneers using total-etch and a modified self-etch adhesive system.

    PubMed

    Aykor, Arzu; Ozel, Emre

    2009-01-01

    This study evaluated the long-term clinical performance of porcelain laminate veneers luted with hybrid composite in combination with total-etch and self-etch adhesive systems. The study was performed on 30 patients ranging in age between 28 and 54 years. Ten veneers were performed per patient in the maxillary arch. In Group 1, 150 teeth were treated with porcelain veneers, using a total-etch adhesive system (Scotchbond Multi-Purpose Plus, 3M ESPE). In Group 2, 150 teeth were bonded with a self-etch adhesive system (AdheSE, Ivoclar-Vivadent). All the veneers were luted with a light-cured hybrid composite (Z100, 3M ESPE). The patients were recalled after 1, 2 and 5 years. Modified United States Public Health Service (USPHS) criteria were utilized to evaluate the porcelain laminate veneers in terms of marginal adaptation, cavo-surface marginal discoloration, secondary caries, postoperative sensitivity, satisfaction with restoration shade and gingival tissue response. Data were analyzed using the Chi-Square test (p < 0.05). There was no statistically significant difference between the total-etch and self-etch groups in terms of USPHS criteria (p > 0.05). Porcelain veneers exhibited successful clinical performance with both total-etch and two-step self-etch adhesives at the end of five-years.

  9. Optimization of shunt isolation processing for silicon solar cells via laser and chemical etching

    NASA Astrophysics Data System (ADS)

    Hao, H. L.; Zhong, S. H.; Zhang, X.; Shen, W. Z.

    2014-08-01

    We employ laser scribing combined with chemical etching process to isolate the shunts in industrial off-spec or non-prime crystalline solar cells. Liquid crystal sheet and Infrared camera measurements have been carried out to reveal the existence of the shunts and hot spot temperature under reverse bias. Following laser scribing with proper laser parameters, chemical etching has been used to further optimize the isolation effect. Through illuminated current-voltage characteristic measurements, the improved open circuit voltage, fill factor and efficiency have been obtained. These results demonstrate that this combined shunt isolation process has great potential for its application in the solar cells.

  10. In situ monitoring of plasma etch processes with a quantum cascade laser arrangement in semiconductor industrial environment

    NASA Astrophysics Data System (ADS)

    Lang, N.; Röpcke, J.; Zimmermann, H.; Steinbach, A.; Wege, S.

    2009-03-01

    Concentrations of the etch product SiF4 were measured online and in situ in technological etch plasmas with an especially designed quantum cascade laser arrangement for application in semiconductor industrial environment, the Q-MACS Etch. The combination of quantum cascade lasers and infra red absorption spectroscopy (QCLAS) opens up new attractive possibilities for plasma process monitoring and control. With the realization of a specific interface the Q-MACS Etch system is synchronized to the etch process and allows therefore automated measurements, which is important in a high volume production environment.

  11. The research on mechanical effect etching Si in pulsed laser micromaching under water

    NASA Astrophysics Data System (ADS)

    Yuhong, Long; Liangcai, Xiong; Tielin, Shi

    2011-02-01

    To explore further the influencing of mechanical effects on laser machining in the liquid, in the process of great-energy and short-pulsed laser irradiating matter in the liquid, the experiments of 248 nm laser etching n-Si under water were carried out. The removal mechanism of brittle material etched by mechanical effects, which is induced during high-energy and short-pulsed laser machining in the liquid, was discussed. In the paper, the approximate mechanics model of indentation fracture was used to analyze the mechanical effects for removing brittle materials of silicon when laser machining in the liquid. Based on this, a theoretical model of material removal rate was proposed; the experiment of laser machining under water was adopted to validate the model. The experimental results indicate that the removal rate of brittle material caused by shock forces is relatively great.

  12. Selforganized Structure Formation in Organized Microstructuring by Laser-Jet Etching

    NASA Astrophysics Data System (ADS)

    Rabbow, T. J.; Plath, P. J.; Mora, A.; Haase, M.

    Laser-jet induced wet etching of stainless steel in 5M H3PO4 has been investigated. By this method, it is possible to cut and microstructure metals and alloys that form passive layers in strong etchants. Due to the laser heating of the metal and the adjacent layers of the etchant, the passive layer is removed and an active dissolution of the base metal together with the formation of hydrogen is observed. The reactions are limited by the transport of fresh acid and the removal of dissolved metal. A jet of etchant reduces the transport limitations. For definite ranges of the laser power, the feed velocity and the etchant jet velocity, a regime of periodic structure formation of the kerf, often called ripples, has been found. The ripple length depends on all three parameters. The ripple formation can be brought into correlation with a periodic change of the intensity of the reflected light as well as oscillations of the potential workpiece. It could be shown that the periodic structure formation is connected to a spreading of an etching front from the laser activated area, that temporarily moves ahead to the laser. This leads to modulations of the interface for the laser absorption, which results, for example, in oscillations of the intensity of the reflected light. This means the laser induced etching reaction attracts a feedback based on the conditions of absorption for the laser. For those parameters of feed velocity, laser power and etchant jet velocity, without ripple formation the laser induced etching front is of a constant distance to the laser which results in steady conditions at the interface for the absorption of the laser.

  13. Comparison of shear bond strength of reattached incisor fragment using Er,Cr:YSGG laser etching and conventional acid etching: An in vitro study

    PubMed Central

    Kumar, Gyanendra; Goswami, Mridula; Dhillon, Jatinder Kaur

    2016-01-01

    Aim: The aim of this invitro study is to evaluate the shear bond strength of reattached fractured incisor fragments using Er,Cr:YSGG laser and conventional acid etching without additional tooth preparation. Materials and methods: Forty extracted human teeth were divided in two groups of 20 each (Groups A and B). In Group A, fractured surface was treated by an Er, Cr: YSGG laser system (Waterlase MD, Biolase Technology Inc., San Clemente, CA, USA) operating at a wavelength of 2,780 nm and frequency of 20 Hz. In Group B, fractured surface was etched using 37% phosphoric acid (Scotchbond, 3M). In both the groups, further subdivision with 10 sample each was made based on horizontal and oblique fracture. After laser or acid etching, all the samples were reattached using flowable composite resin and light cured. The samples were tested for shear bond strength. Results: Mean shear bond strength for Group A (94.70±39.158) was lower as compared to Group B (121.25±49.937), although the difference was not statistically significant(p value=0.121). Similarly no statistical significant difference was observed amongst the subgroups. (p>0.05) Conclusion: Er,Cr:YSGG laser etching in reattachment of fractured incisor fragment is a good alternative to conventional acid etching. Er,Cr:YSGG showed comparable efficiency in rebonding of fractured teeth fragment as acid etching. PMID:27721563

  14. Laser surface pretreatment of 100Cr6 bearing steel - Hardening effects and white etching zones

    NASA Astrophysics Data System (ADS)

    Buling, Anna; Sändker, Hendrik; Stollenwerk, Jochen; Krupp, Ulrich; Hamann-Steinmeier, Angela

    2016-08-01

    In order to achieve a surface pretreatment of the bearing steel 100Cr6 (1-1.5 wt.% Cr) a laser-based process was used. The obtained modification may result in an optimization of the adhesive properties of the surface with respect to an anticorrosion polymer coating on the basis of PEEK (poly-ether-ether-ketone), which is applied on the steel surface by a laser melting technique. This work deals with the influence of the laser-based pretreatment regarding the surface microstructure and the micro-hardness of the steel, which has been examined by scanning electron microscopy (SEM), light microscopy and automated micro-hardness testing. The most suitable parameter set for the laser-based pretreatment leads to the formation of very hard white etching zones (WEZ) with a thickness of 23 μm, whereas this pretreatment also induces topographical changes. The occurrence of the white etching zones is attributed to near-surface re-austenitization and rapid quenching. Moreover, dark etching zones (DEZ) with a thickness of 32 μm are found at the laser path edges as well as underneath the white etching zones (WEZ). In these areas, the hardness is decreased due to the formation of oxides as a consequence of re-tempering.

  15. Improving UV laser damage threshold of fused silica optics by wet chemical etching technique

    NASA Astrophysics Data System (ADS)

    Ye, Hui; Li, Yaguo; Yuan, Zhigang; Wang, Jian; Xu, Qiao; Yang, Wei

    2015-07-01

    Fused silica is widely used in high-power laser systems because of its good optical performance and mechanical properties. However, laser damage initiation and growth induced by 355 nm laser illumination in optical elements have become a bottleneck in the development of high energy laser system. In order to improve the laser-induced damage threshold (LIDT), the fused silica optics were treated by two types of HF-based etchants: 1.7%wt. HF acid and buffer oxide etchant (BOE: the mixture of 0.4%wt. HF and 12%wt. NH4F), respectively, for varied etching time. Damage testing shows that both the etchants increase the damage threshold at a certain depth of material removal, but further removal of material lowers the LIDT markedly. The etching rates of both etchants keep steady in our processing procedure, ~58 μg/min and ~85 μg/min, respectively. The micro-surface roughness (RMS and PV) increases as etching time extends. The hardness (H) and Young's modulus (E) of the fused silica etched for diverse time, measured by nano-indenter, show no solid evidence that LIDT can be related to hardness or Young's modulus.

  16. Production of submicrometre fused silica gratings using laser-induced backside dry etching technique

    NASA Astrophysics Data System (ADS)

    Hopp, B.; Vass, Cs; Smausz, T.; Bor, Zs

    2006-11-01

    Laser micromachining of transparent materials is a promising technique for producing micro-optical elements. Several types of both direct (e.g. ablation) and indirect (e.g. laser-induced backside wet etching: LIBWE) procedures have already been developed and presented in the last two decades. Here we present a new method (laser-induced backside dry etching (LIBDE)) in the analogy of LIBWE for the micro and nanoprocessing of transparent materials. In our experiments 1 mm thick fused silica plates were used as transparent work pieces. The plates were covered with 100 nm thick silver layers. The metal absorbing films were irradiated through the fused silica by a KrF excimer laser beam (λ = 248 nm, FWHM = 30 ns). The illuminated area was 1.05 mm2 and the fluence on the silver-quartz interface varied in the range 0-1800 mJ cm-2. We have provided evidence that LIBDE is more effective and simple than LIBWE, its etch rate being much higher at a given laser fluence. Our interference experiments proved that the LIBDE etching technique is suitable to fabricate gratings displaying submicrometre periods in transparent materials. On the basis of all these, it is suggested that this method may be useful to produce other nano and microoptical elements, too.

  17. Effects of wet etch processing on laser-induced damage of fused silica surfaces

    SciTech Connect

    Battersby, C.L.; Kozlowski, M.R.; Sheehan, L.M.

    1998-12-22

    Laser-induced damage of transparent fused silica optical components by 355 nm illumination occurs primarily at surface defects produced during the grinding and polishing processes. These defects can either be surface defects or sub-surface damage.Wet etch processing in a buffered hydrogen fluoride (HF) solution has been examined as a tool for characterizing such defects. A study was conducted to understand the effects of etch depth on the damage threshold of fused silica substrates. The study used a 355 nm, 7.5 ns, 10 Hz Nd:YAG laser to damage test fused silica optics through various wet etch processing steps. Inspection of the surface quality was performed with Nomarski microscopy and Total Internal Reflection Microscopy. The damage test data and inspection results were correlated with polishing process specifics. The results show that a wet etch exposes subsurface damage while maintaining or improving the laser damage performance. The benefits of a wet etch must be evaluated for each polishing process.

  18. Influence of laser etching on enamel and dentin bond strength of Silorane System Adhesive.

    PubMed

    Ustunkol, Ildem; Yazici, A Ruya; Gorucu, Jale; Dayangac, Berrin

    2015-02-01

    The aim of this in vitro study was to evaluate the shear bond strength (SBS) of Silorane System Adhesive to enamel and dentin surfaces that had been etched with different procedures. Ninety freshly extracted human third molars were used for the study. After the teeth were embedded with buccal surfaces facing up, they were randomly divided into two groups. In group I, specimens were polished with a 600-grit silicon carbide (SiC) paper to obtain flat exposed enamel. In group II, the overlying enamel layer was removed and exposed dentin surfaces were polished with a 600-grit SiC paper. Then, the teeth in each group were randomly divided into three subgroups according to etching procedures: etched with erbium, chromium:yttrium-scandium-gallium-garnet laser (a), etched with 35% phosphoric acid (b), and non-etched (c, control). Silorane System Adhesive was used to bond silorane restorative to both enamel and dentin. After 24-h storage in distilled water at room temperature, a SBS test was performed using a universal testing machine at a crosshead speed of 1 mm/min. The data were analyzed using two-way ANOVA and Bonferroni tests (p < 0.05). The highest SBS was found after additional phosphoric acid treatment in dentin groups (p < 0.05). There were no statistically significant differences between the laser-etched and non-etched groups in enamel and dentin (p > 0.05). The SBS of self-etch adhesive to dentin was not statistically different from enamel (p > 0.05). Phosphoric acid treatment seems the most promising surface treatment for increasing the enamel and dentin bond strength of Silorane System Adhesive.

  19. Modified Fabrication for InGaAsP Strip Laser

    NASA Technical Reports Server (NTRS)

    Ladany, I.; Furman, T. R.

    1984-01-01

    Improved fabrication of InGaAsP stripe lasers involves replacement of oxide stripe in quaternary laser by an n-type layer of InP grown on top of quaternary cap layer. Process allows use of stop etch that selectively removes InP and does not etch InGaAsP, making fabrication especially convenient.

  20. [INVITED] On the mechanisms of single-pulse laser-induced backside wet etching

    NASA Astrophysics Data System (ADS)

    Tsvetkov, M. Yu.; Yusupov, V. I.; Minaev, N. V.; Akovantseva, A. A.; Timashev, P. S.; Golant, K. M.; Chichkov, B. N.; Bagratashvili, V. N.

    2017-02-01

    Laser-induced backside wet etching (LIBWE) of a silicate glass surface at interface with a strongly absorbing aqueous dye solution is studied. The process of crater formation and the generated optoacoustic signals under the action of single 5 ns laser pulses at the wavelength of 527 nm are investigated. The single-pulse mode is used to avoid effects of incubation and saturation of the etched depth. Significant differences in the mechanisms of crater formation in the "soft" mode of laser action (at laser fluencies smaller than 150-170 J/cm2) and in the "hard" mode (at higher laser fluencies) are observed. In the "soft" single-pulse mode, LIBWE produces accurate craters with the depth of several hundred nanometers, good shape reproducibility and smooth walls. Estimates of temperature and pressure of the dye solution heated by a single laser pulse indicate that these parameters can significantly exceed the corresponding critical values for water. We consider that chemical etching of glass surface (or molten glass) by supercritical water, produced by laser heating of the aqueous dye solution, is the dominant mechanism responsible for the formation of crater in the "soft" mode. In the "hard" mode, the produced craters have ragged shape and poor pulse-to-pulse reproducibility. Outside the laser exposed area, cracks and splits are formed, which provide evidence for the shock induced glass fracture. By measuring the amplitude and spectrum of the generated optoacoustic signals it is possible to conclude that in the "hard" mode of laser action, intense hydrodynamic processes induced by the formation and cavitation collapse of vapor-gas bubbles at solid-liquid interface are leading to the mechanical fracture of glass. The LIBWE material processing in the "soft" mode, based on chemical etching in supercritical fluids (in particular, supercritical water) is very promising for structuring of optical materials.

  1. HF-based etching processes for improving laser damage resistance of fused silica optical surfaces

    SciTech Connect

    Suratwala, T I; Miller, P E; Bude, J D; Steele, R A; Shen, N; Monticelli, M V; Feit, M D; Laurence, T A; Norton, M A; Carr, C W; Wong, L L

    2010-02-23

    The effect of various HF-based etching processes on the laser damage resistance of scratched fused silica surfaces has been investigated. Conventionally polished and subsequently scratched fused silica plates were treated by submerging in various HF-based etchants (HF or NH{sub 4}F:HF at various ratios and concentrations) under different process conditions (e.g., agitation frequencies, etch times, rinse conditions, and environmental cleanliness). Subsequently, the laser damage resistance (at 351 or 355 nm) of the treated surface was measured. The laser damage resistance was found to be strongly process dependent and scaled inversely with scratch width. The etching process was optimized to remove or prevent the presence of identified precursors (chemical impurities, fracture surfaces, and silica-based redeposit) known to lead to laser damage initiation. The redeposit precursor was reduced (and hence the damage threshold was increased) by: (1) increasing the SiF{sub 6}{sup 2-} solubility through reduction in the NH4F concentration and impurity cation impurities, and (2) improving the mass transport of reaction product (SiF{sub 6}{sup 2-}) (using high frequency ultrasonic agitation and excessive spray rinsing) away from the etched surface. A 2D finite element crack-etching and rinsing mass transport model (incorporating diffusion and advection) was used to predict reaction product concentration. The predictions are consistent with the experimentally observed process trends. The laser damage thresholds also increased with etched amount (up to {approx}30 {micro}m), which has been attributed to: (1) etching through lateral cracks where there is poor acid penetration, and (2) increasing the crack opening resulting in increased mass transport rates. With the optimized etch process, laser damage resistance increased dramatically; the average threshold fluence for damage initiation for 30 {micro}m wide scratches increased from 7 to 41 J/cm{sup 2}, and the statistical

  2. Self-organization of hydrogen gas bubbles rising above laser-etched metallic aluminum in a weakly basic aqueous solution.

    PubMed

    Barmina, E V; Kuzmin, P G; Shafeev, G A

    2011-10-01

    Self-organization of hydrogen bubbles is reported under etching of metallic Aluminum in a weakly basic solution. The ascending gas bubbles drift to the areas with higher density of bubbles. As a result, ascending bubbles form various stationary structures whose symmetry is determined by the symmetry of the etched area. Bubbles are aligned along the bisectors of the contour of the etched area. The special laser-assisted profiling of the etched area in shape of a vortex induces a torque in the fluid above the etched area. The process is interpreted on the basis of Bernoulli equation.

  3. Fabrication of high-aspect-ratio grooves in silicon using femtosecond laser irradiation and oxygen-dependent acid etching.

    PubMed

    Pan, An; Si, Jinhai; Chen, Tao; Ma, Yuncan; Chen, Feng; Hou, Xun

    2013-07-15

    We demonstrated a new method to fabricate micron-sized grooves with high aspect ratios in silicon wafers by combining femtosecond laser irradiation and oxygen-dependent acid etching. Femtosecond laser was employed to induce structure changes and incorporate oxygen into silicon, and then materials in oxygen-containing regions were etched by hydrofluoric acid (HF) solution to form grooves. The etching could be attributed to the reaction between HF and silicon oxides formed by femtosecond laser irradiation. The dependences of the aspect ratios of grooves on the laser fluence and the scanning velocity were also investigated.

  4. Optically transparent glass micro-actuator fabricated by femtosecond laser exposure and chemical etching

    NASA Astrophysics Data System (ADS)

    Lenssen, Bo; Bellouard, Yves

    2012-09-01

    Femtosecond laser manufacturing combined with chemical etching has recently emerged as a flexible platform for fabricating three-dimensional devices and integrated optical elements in glass substrates. Here, we demonstrate an optically transparent micro-actuator fabricated out of a single piece of fused silica. This work paves the road for further functional integration in glass substrate and optically transparent microsystems.

  5. Silicon microstructure fabricated by laser micro-patterning method combined with wet etching process

    NASA Astrophysics Data System (ADS)

    Oishi, T.; Goto, M.; Pihosh, Y.; Kasahara, A.; Tosa, M.

    2005-02-01

    A simple method for silicon microfabrication has been successfully developed. Polypropylene (PP) film as a resist was prepared on a surface of silicon (Si) (1 0 0) plate by an rf magnetron sputtering method. A pulsed laser light was focused and irradiated to the PP film and a part of the film was removed by laser ablation process in the spot at certain laser intensity. When the sample was immersed in a potassium hydroxide solution, etching occurred only at the part that the PP film was removed by laser ablation. These results raise the possibility of this method as a process for Si microfabrication.

  6. Schottky barrier restricted AlGaAs laser with an etched mesa ohmic contact

    NASA Astrophysics Data System (ADS)

    Reynolds, C. L., Jr.; Holbrook, W. R.; Nygren, S. F.; Shimer, J. A.; Logan, R. A.; Temkin, H.

    1984-10-01

    A gain-guided AlGaAs double heterostructure laser which employs a Schottky barrier in conjunction with a p-GaAs etched mesa contact for current isolation has been fabricated. This Schottky barrier restricted structure provides a device whose electrical and optical characteristics are comparable to that of other gain-guided lasers and which is simple to fabricate. Preliminary aging data indicate high reliability of the Schottky barrier restriction.

  7. Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses

    NASA Astrophysics Data System (ADS)

    Yu, Xiaoming; Liao, Yang; He, Fei; Zeng, Bin; Cheng, Ya; Xu, Zhizhan; Sugioka, Koji; Midorikawa, Katsumi

    2011-03-01

    We report on experimental study on chemical etch selectivity of fused silica irradiated by femtosecond laser with either linear or circular polarization in a wide range of pulse energies. The relationships between the etch rates and pulse energies are obtained for different polarization states, which can be divided into three different regions. A drop of the etch rate for high pulse energy region is observed and the underlying mechanism is discussed. The advantage of using circularly polarized laser is justified owing to its unique capability of providing a 3D isotropic etch rate.

  8. Bond strength of composite to dentin: effect of acid etching and laser irradiation through an uncured self-etch adhesive system

    NASA Astrophysics Data System (ADS)

    Castro, F. L. A.; Carvalho, J. G.; Andrade, M. F.; Saad, J. R. C.; Hebling, J.; Lizarelli, R. F. Z.

    2014-08-01

    This study evaluated the effect on micro-tensile bond strength (µ-TBS) of laser irradiation of etched/unetched dentin through an uncured self-etching adhesive. Dentinal surfaces were treated with Clearfil SE Bond Adhesive (CSE) either according to the manufacturer’s instructions (CSE) or without applying the primer (CSE/NP). The dentin was irradiated through the uncured adhesive, using an Nd:YAG laser at 0.75 or 1 W power settings. The adhesive was cured, composite crowns were built up, and the teeth were sectioned into beams (0.49 mm2) to be stressed under tension. Data were analyzed using one-way ANOVA and Tukey statistics (α = 5%). Dentin of the fractured specimens and the interfaces of untested beams were observed under scanning electron microscopy (SEM). The results showed that non-etched irradiated surfaces presented higher µ-TBS than etched and irradiated surfaces (p < 0.05). Laser irradiation alone did not lead to differences in µ-TBS (p > 0.05). SEM showed solidification globules on the surfaces of the specimens. The interfaces were similar on irradiated and non-irradiated surfaces. Laser irradiation of dentin through the uncured adhesive did not lead to higher µ-TBS when compared to the suggested manufacturer’s technique. However, this treatment brought benefits when performed on unetched dentin, since bond strengths were higher when compared to etched dentin.

  9. Marginal microleakage of resin-modified glass-ionomer and composite resin restorations: effect of using etch-and-rinse and self-etch adhesives.

    PubMed

    Khoroushi, Maryam; Karvandi, Tayebeh Mansouri; Kamali, Bentolhoda; Mazaheri, Hamid

    2012-01-01

    Previous studies have shown that dental adhesives increase the bond strength of resin-modified glass-ionomer (RMGI) restorative materials to dentin. This in vitro study has evaluated the effect of etch-and-rinse and self-etch bonding systems v/s cavity conditioner, and in comparison to similar composite resin restorations on maintaining the marginal sealing of RMGI restorations. 98 rectangular cavities (2.5×3×1.5 mm) were prepared on buccal and palatal aspects of 49 human maxillary premolars, randomly divided into 7 groups (N=14). The cavities in groups 1, 2 and 3 were restored using a composite resin (APX). The cavities in groups 4, 5, 6 and 7 were restored using a resin-modified glass-ionomer (Fuji II LC). Before restoring, adhesive systems (Optibond FL = OFL, three-step etch-and-rinse; One Step Plus = OSP, two-step etch-and-rinse; Clearfil Protect Bond = CPB, two-step self-etch) were used as bonding agents in groups 1-6 as follow: OFL in groups 1 and 4, OSP in groups 2 and 5, and CPB in groups 3 and 6, respectively. The specimens in group 7 were restored with GC cavity conditioner and Fuji II LC. All the specimens were thermo-cycled for 1000 cycles. Microleakage scores were determined using dye penetration method. Statistical analyzes were carried out with Kruskal-Wallis and Mann-Whitney U tests (α=0.05). There were significant differences in microleakage scores at both enamel and dentinal margins between the study groups (P<0.05). The lowest microleakage scores at enamel and dentin margins of RMGI restorations were observed in group 6. Use of two-step self-etch adhesive, prior to restoring cervical cavities with RMGIC, seems to be more efficacious than the conventional cavity conditioner in decreasing marginal microleakage.

  10. Fabrication of 3D solenoid microcoils in silica glass by femtosecond laser wet etch and microsolidics

    NASA Astrophysics Data System (ADS)

    Meng, Xiangwei; Yang, Qing; Chen, Feng; Shan, Chao; Liu, Keyin; Li, Yanyang; Bian, Hao; Du, Guangqing; Hou, Xun

    2015-02-01

    This paper reports a flexible fabrication method for 3D solenoid microcoils in silica glass. The method consists of femtosecond laser wet etching (FLWE) and microsolidics process. The 3D microchannel with high aspect ratio is fabricated by an improved FLWE method. In the microsolidics process, an alloy was chosen as the conductive metal. The microwires are achieved by injecting liquid alloy into the microchannel, and allowing the alloy to cool and solidify. The alloy microwires with high melting point can overcome the limitation of working temperature and improve the electrical property. The geometry, the height and diameter of microcoils were flexibly fabricated by the pre-designed laser writing path, the laser power and etching time. The 3D microcoils can provide uniform magnetic field and be widely integrated in many magnetic microsystems.

  11. Effects of thermo-plasmonics on laser-induced backside wet etching of silicate glass

    NASA Astrophysics Data System (ADS)

    Tsvetkov, M. Yu; Yusupov, V. I.; Minaev, N. V.; Timashev, P. S.; Golant, K. M.; Bagratashvili, V. N.

    2016-10-01

    The thermo-plasmonic effect (heat deposition via absorption of laser light by metal nanoparticles) is applied to substantially enhance the effectiveness and controllability of the microstructure formation by laser-induced backside wet etching (LIBWE). Experiments were carried out with silicate glass plates using a pulsed 527 nm wavelength laser and an aqueous solution of AgNO3 as a precursor of the Ag nanoparticles. Mechanisms of such thermo-plasmonic LIBWE (TP-LIBWE) versions are considered. They involve: laser-induced photo-thermal reducing of silver (Ag) and self-assembling of Ag nanoparticles in water and the water/glass interface; fast laser-induced overheating of a water and glass surface through the thermo-plasmonic effect; formation of highly reactive supercritical water that causes glass etching and crater formation; generation of steam-gas bubbles in a liquid. It is significant that the emergence of the Marangoni convection results in bubble retention in the focal point at the interface and the accumulation of nanoparticles on the surface of the laser-induced crater, as this facilitates the movement of the bubbles with captured Ag particles from the fluid volume in the crater region, and accelerates the formation of the area of strong ‘surface absorption’ of laser energy. All these mechanisms provide a highly efficient and reproducible process for laser microstructure formation on the surface of glass using a novel TP-LIBWE technique.

  12. Endpoint in plasma etch process using new modified w-multivariate charts and windowed regression

    NASA Astrophysics Data System (ADS)

    Zakour, Sihem Ben; Taleb, Hassen

    2017-02-01

    Endpoint detection is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done in the right way, especially if the etched area is very small (0.1%). It truly is a crucial part of supplying repeatable effects in every single wafer. When the film being etched has been completely cleared, the endpoint is reached. To ensure the desired device performance on the produced integrated circuit, the high optical emission spectroscopy (OES) sensor is employed. The huge number of gathered wavelengths (profiles) is then analyzed and pre-processed using a new proposed simple algorithm named Spectra peak selection (SPS) to select the important wavelengths, then we employ wavelet analysis (WA) to enhance the performance of detection by suppressing noise and redundant information. The selected and treated OES wavelengths are then used in modified multivariate control charts (MEWMA and Hotelling) for three statistics (mean, SD and CV) and windowed polynomial regression for mean. The employ of three aforementioned statistics is motivated by controlling mean shift, variance shift and their ratio (CV) if both mean and SD are not stable. The control charts show their performance in detecting endpoint especially W-mean Hotelling chart and the worst result is given by CV statistic. As the best detection of endpoint is given by the W-Hotelling mean statistic, this statistic will be used to construct a windowed wavelet Hotelling polynomial regression. This latter can only identify the window containing endpoint phenomenon.

  13. Endpoint in plasma etch process using new modified w-multivariate charts and windowed regression

    NASA Astrophysics Data System (ADS)

    Zakour, Sihem Ben; Taleb, Hassen

    2017-02-01

    Endpoint detection is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done in the right way, especially if the etched area is very small (0.1%). It truly is a crucial part of supplying repeatable effects in every single wafer. When the film being etched has been completely cleared, the endpoint is reached. To ensure the desired device performance on the produced integrated circuit, the high optical emission spectroscopy (OES) sensor is employed. The huge number of gathered wavelengths (profiles) is then analyzed and pre-processed using a new proposed simple algorithm named Spectra peak selection (SPS) to select the important wavelengths, then we employ wavelet analysis (WA) to enhance the performance of detection by suppressing noise and redundant information. The selected and treated OES wavelengths are then used in modified multivariate control charts (MEWMA and Hotelling) for three statistics (mean, SD and CV) and windowed polynomial regression for mean. The employ of three aforementioned statistics is motivated by controlling mean shift, variance shift and their ratio (CV) if both mean and SD are not stable. The control charts show their performance in detecting endpoint especially W-mean Hotelling chart and the worst result is given by CV statistic. As the best detection of endpoint is given by the W-Hotelling mean statistic, this statistic will be used to construct a windowed wavelet Hotelling polynomial regression. This latter can only identify the window containing endpoint phenomenon.

  14. Sub-surface channels in sapphire made by ultraviolet picosecond laser irradiation and selective etching.

    PubMed

    Moser, Rüdiger; Ojha, Nirdesh; Kunzer, Michael; Schwarz, Ulrich T

    2011-11-21

    We demonstrate the realization of sub-surface channels in sapphire prepared by ultraviolet picosecond laser irradiation and subsequent selective wet etching. By optimizing the pulse energy and the separation between individual laser pulses, an optimization of channel length can be achieved with an aspect ratio as high as 3200. Due to strong variation in channel length, further investigation was done to improve the reproducibility. By multiple irradiations the standard deviation of the channel length could be reduced to 2.2%. The achieved channel length together with the high reproducibility and the use of a commercial picosecond laser system makes the process attractive for industrial application.

  15. Improved response time of laser etched polymer optical fiber Bragg grating humidity sensor

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Chen, Xianfeng; Liu, Chen; Lu, Yuanfu; Cardoso, Marcos; Webb, David J.

    2015-09-01

    The humidity sensor made of polymer optical fiber Bragg grating (POFBG) responds to the water content change in fiber induced by the change of environmental condition. The response time strongly depends on fiber size as the water change is a diffusion process. The ultrashort laser pulses have been providing an effective microfabrication method to achieve spatial localized modification in materials. In this work we used the excimer laser to create different microstructures (slot, D-shape) in POFBG to improve its performance. A significant improvement in the response time has been achieved in a laser etched D-shaped POFBG humidity sensor.

  16. Retention of Proteins and Metalloproteins in Open Tubular Capillary Electrochromatography with Etched Chemically Modified Columns

    PubMed Central

    Pesek, Joseph J.; Matyska, Maria T.; Salgotra, Vasudha

    2010-01-01

    Etched chemically modified capillaries with two different bonded groups (pentyl and octadecyl) are compared for their migration behavior of several common proteins and metalloproteins as well as metalloproteinases. Migration times, efficiency and peak shape are evaluated over the pH range of 2.1 to 8.1 to determine any effects of the bonded group on the electrochromatographic behavior of these compounds. One goal was to determine if the relative hydrophobicity of the stationary phase has a significant effect on proteins in the open tubular format of capillary electrochromatography as it does in HPLC. Reproducibility of the migration times is also investigated. PMID:18850653

  17. Surface-etched distributed Bragg reflector lasers in photonic integrated circuits

    NASA Astrophysics Data System (ADS)

    Price, Raymond Kirk

    Semiconductor lasers have been used as a highly efficient, coherent source of light for commercial, industrial, and medical applications. Recently, much work has been done to engineer optical devices with a high degree of functionality. Photonic integrated circuits (PICs) achieve technology's twin goals of miniaturization and integration by implementing multiple optical functions on a single chip. This dissertation shows that asymmetric cladding surface-etched distributed Bragg reflector (ACSE-DBR) lasers are ideal candidates for monolithic photonic integration for the purpose of optical heterodyning. The active laser devices in these ACSE-DBR lasers exhibit high quantum efficiencies, tunable performance, and narrow spectral linewidths. The asymmetric cladding ridge waveguides are shown to provide low-loss routing structures, enabling monolithic integration of active and passive devices with a small layout footprint. This technology is applied to two specific purposes: a dual wavelength source for generating terahertz radiation via optical heterodyning, and high-power DBR laser arrays for spectral beam combining. A dual-wavelength PIC at 850 nm for the purpose of optical heterodyning is presented in this work. The engineering of the active and passive structures is extensively analyzed. These structures are shown to be ideally suited for high pulsed-power optical heterodyning applications. A high-power DBR laser array is also presented for use in spectral beam combining systems. The laser structure for this application is engineered for high-power applications. The engineering of the lateral optical guiding structure as well as the surface-etched grating is discussed.

  18. Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics

    NASA Astrophysics Data System (ADS)

    Pfiffer, Mathilde; Cormont, Philippe; Néauport, Jérôme; Lambert, Sébastien; Fargin, Evelyne; Bousquet, Bruno; Dussauze, Marc

    2016-12-01

    Effects of deep wet etching on the surface quality and the laser induced damage probability have been studied on fused silica samples. Results obtained with a HF/HNO3 solution and a KOH solution were compared on both polished pristine surface and scratched surfaces. The hydrofluoric solution radically deteriorated the surface quality creating a haze on the whole surface and increasing considerably the roughness. For both solutions, neither improvement nor deterioration of the laser damage performances has been observed on the etched surfaces while the laser damage resistance of scratches has been increased to the level of the surface. We conclude that laser damage performances are equivalent with both solutions but an acid etching induces surface degradation that is not experienced with basic etching.

  19. III-Nitride Blue Laser Diode with Photoelectrochemically Etched Current Aperture

    NASA Astrophysics Data System (ADS)

    Megalini, Ludovico

    Group III-nitride is a remarkable material system to make highly efficient and high-power optoelectronics and electronic devices because of the unique electrical, physical, chemical and structural properties it offers. In particular, InGaN-based blue Laser Diodes (LDs) have been successfully employed in a variety of applications ranging from biomedical and military devices to scientific instrumentation and consumer electronics. Recently their use in highly efficient Solid State Lighting (SSL) has been proposed because of their superior beam quality and higher efficiency at high input power density. Tremendous advances in research of GaN semi-polar and non-polar crystallographic planes have led both LEDs and LDs grown on these non-basal planes to rival with, and with the promise to outperform, their equivalent c-plane counterparts. However, still many issues need to be addressed, both related to material growth and device fabrication, including a lack of conventional wet etching techniques. GaN and its alloys with InN and AlN have proven resistant essentially to all known standard wet etching techniques, and the predominant etching methods rely on chlorine-based dry etching (RIE). These introduce sub-surface damage which can degrade the electrical properties of the epitaxial structure and reduce the reliability and lifetime of the final device. Such reasons and the limited effectiveness of passivation techniques have so far suggested to etch the LD ridges before the active region, although it is well-known that this can badly affect the device performance, especially in narrow stripe width LDs, because the gain guiding obtained in the planar configuration is weak and the low index step and high lateral current leakage result in devices with threshold current density higher than devices whose ridge is etched beyond the active region. Moreover, undercut etching of III-nitride layers has proven even more challenging, with limitations in control of the lateral etch

  20. Structuring of glass fibre surfaces by laser-induced front side etching

    NASA Astrophysics Data System (ADS)

    Lorenz, Pierre; Ehrhardt, Martin; Zimmer, Klaus

    2014-05-01

    The fabrication of sub-μm structures on glass fibre surfaces poses a big challenge for the laser processing. However, the laser-induced front side etching (LIFE) method has a great potential for the fast, nm-precision, and cost-effective production of surface structures. LIFE is a method for laser etching of transparent materials using thin absorber layers with a high absorption coefficient like metal layers. The LIFE process of the front surface of a fused silica wafer as well as of a glass fibre is studied in dependence on the laser parameters. A KrF excimer laser with a wavelength of 248 nm and a pulse duration of 25 ns was used. The resultant structures were analysed with microscopic methods (white light interferometry, scanning electron microscopy (SEM)). The analysing of the surface structures presented that the LIFE methods allow the fabrication of well-defined periodic sub-μm structures. Furthermore, the structuring process was simulated by a thermodynamic equation including an approach of the laser-plasma interaction. The theoretically predicted results presented a good agreement with the experimental results.

  1. Shear Bond Strength of Self-etching Adhesives to Cavities Prepared by Diamond Bur or Er,Cr:YSGG Laser and Effect of Prior Acid Etching.

    PubMed

    Jhingan, Pulkit; Sachdev, Vinod; Sandhu, Meera; Sharma, Karan

    2015-12-01

    To compare and evaluate shear bond strength of self-etching adhesives bonded to cavities prepared by diamond bur or Er,Cr:YSGG laser and the effect of prior acid etching on shear bond strength. Ninety-six caries-free human premolars were selected and divided into 2 groups depending on mode of cavity preparation (48 teeth each). Cavities were prepared with Er,Cr:YSGG laser in group 1 and diamond burs in an air-turbine handpiece in group 2. Groups 1 and 2 were further subdivided into three subgroups of 8 teeth each, which were bonded with sixth- or seventh-generation adhesives with or without prior acid etching, followed by restoration of all samples with APX Flow. These samples were subjected to shear bond strength testing. In addition, the surface morphology of 24 samples each from groups 1 and 2 was evaluated using SEM. Data were analyzed using the Shapiro-Wilk test, one- and two-way ANOVA, the t-test, and the least significant difference test, which showed that the data were normally distributed (p > 0.05). The shear bond strength of adhesives in cavities prepared by Er,Cr:YSGG laser was significantly higher than in diamond bur-prepared cavities (p < 0.05). SEM analysis showed a smear-layer-free anfractuous surface on laser-ablated teeth, in contrast to conventional bur-prepared teeth. The Er,Cr:YSGG laser-ablated surface proved to be more receptive for adhesion than those prepared by diamond bur irrespective of the bonding agent used. Seventh-generation adhesives yielded higher shear bond strength than did sixth-generation adhesives. Prior acid etching decreased the shear bond strength of self-etching adhesives.

  2. Laser-induced local CVD and simultaneous etching of tungsten

    NASA Astrophysics Data System (ADS)

    Tóth, Z.; Piglmayer, K.

    2002-01-01

    Tungsten dots are grown by laser-assisted chemical vapour deposition from a gas mixture of tungsten hexafluoride and hydrogen on a supported thin tungsten film. Local growth is achieved by confined heating of the substrate using the focused beam of a cw Ar + laser. By in situ monitoring the lateral growth of the dots with the help of a microscope-video system, real-time data of the lateral growth have been recorded from single experiments in order to study the kinetics of the process. The competing kinetics of different reaction paths, controlled by the ratio of the precursor gases, investigated. It leads to a change of the apparent activation energy and the morphology.

  3. Etching process for improving the strength of a laser-machined silicon-based ceramic article

    DOEpatents

    Copley, S.M.; Tao, H.; Todd-Copley, J.A.

    1991-06-11

    A process is disclosed for improving the strength of laser-machined articles formed of a silicon-based ceramic material such as silicon nitride, in which the laser-machined surface is immersed in an etching solution of hydrofluoric acid and nitric acid for a duration sufficient to remove substantially all of a silicon film residue on the surface but insufficient to allow the solution to unduly attack the grain boundaries of the underlying silicon nitride substrate. This effectively removes the silicon film as a source of cracks that otherwise could propagate downwardly into the silicon nitride substrate and significantly reduce its strength. 1 figure.

  4. Etching process for improving the strength of a laser-machined silicon-based ceramic article

    DOEpatents

    Copley, Stephen M.; Tao, Hongyi; Todd-Copley, Judith A.

    1991-01-01

    A process for improving the strength of laser-machined articles formed of a silicon-based ceramic material such as silicon nitride, in which the laser-machined surface is immersed in an etching solution of hydrofluoric acid and nitric acid for a duration sufficient to remove substantially all of a silicon film residue on the surface but insufficient to allow the solution to unduly attack the grain boundaries of the underlying silicon nitride substrate. This effectively removes the silicon film as a source of cracks that otherwise could propagate downwardly into the silicon nitride substrate and significantly reduce its strength.

  5. Optical monitoring of surface adlayers by laser-induced thermal desorption during the plasma etching of semiconductors

    NASA Astrophysics Data System (ADS)

    Choe, Jae Young

    1999-11-01

    Laser induced thermal desorption with optical detection by laser induced fluorescence and transient plasma induced emission is used to analyze the surface adlayer during plasma etching of semiconductors, including Si, Ge, and InP. In the investigation of Si etching in a Cl2 inductively coupled plasma (ICP), 308 nm radiation from a XeCl excimer laser heats the surface to desorb the surface species (LD) and excites laser induced fluorescence (LIF) in the desorbing SiCl. This measured LD-LIF optical signal indicates the adlayer chlorine content during steady-state plasma etching. The LD-LIF of SiCl increases with dc substrate bias voltage indicating that the adlayer chlorine content increases with increasing substrate bias. The SiCl LD-LIF signal is almost independent of rf power, while the ion density and etch rate increase by an order of magnitude over the range of rf power studied. In the investigation of Ge etching in a Cl2 ICP, 308 nm radiation from a XeCl excimer laser is used for LD-LIF of GeCl. The LD-LIF of GeCl is also independent of rf power, as for Si etching, but the rate of chlorination is faster than that during Si etching. The GeCl LD-LIF signal remains almost constant as dc substrate bias is increased from 0 V to over -100 V. The transient increase in plasma-induced emission following laser-induced thermal desorption (LD-PIE) is also used to analyze the surface adlayer during Si and InP etching by a Cl2 plasma. Several different species are monitored during Si etching by a Cl2 plasma, including Si, SiCl and SiCl2. The LD-PIE intensities from all of these species increase with rf power. In order to properly interpret the LD-PIE signal to determine the level of surface chlorination, the LD-PIE signal is normalized by the electron density. The LD-PIE intensities during Si etching increase with the dc substrate bias as in the LD-LIF study. Both the LD-LIF and LD-PIE measurements of Si etching are consistent with each other for determining the adlayer

  6. Effects of laser and acid etching and air abrasion on mineral content of dentin.

    PubMed

    Malkoc, Meral Arslan; Taşdemir, Serife Tuba; Ozturk, A Nilgun; Ozturk, Bora; Berk, Gizem

    2011-01-01

    The aim of this study was to evaluate the mineral content of dentin prepared using an Er,Cr:YSGG laser at four different power settings, acid etching, and air abrasion. The study teeth comprised 35 molars which were randomly divided into seven equal groups. The occlusal third of the crowns were cut with a slow-speed diamond saw. The groups were as follows: group A, control group; group B, dentin etched with 35% buffered phosphoric acid for 30 s; group C, dentin abraded at 60 psi with 50-µm aluminium oxide for 1 s; groups D-G, dentin irradiated with the Er,Cr:YSGG laser at 1.50 W (group D), 2.25 W (group E), 3.00 W (group F), and 3.50 W (group G). The levels of Mg, P, Ca, K and Na in each dentin slab were measured by inductively coupled plasma-atomic emission spectrometry (ICP-AES). Data were analysed by one way analysis of variance and Tukey HSD tests. There were no significant differences between the groups in the levels of Ca, P and Na, and the Ca/P ratio (p>0.05); however, there were significant differences in the levels of K (p<0.001) and Mg (p=0.13). In addition, the levels of Mg in the air abrasion group were higher than in the other groups (p<0.01). Etching with the Er,Cr:YSGG laser system, air abrasion and acid etching did not affect the levels of Ca, P and Na, or the Ca/P ratio, in the dentin surface.

  7. Surface microstructures of silica glass by laser-induced backside wet etching

    NASA Astrophysics Data System (ADS)

    Niino, H.; Kawaguchi, Y.; Sato, T.; Narazaki, A.; Kurosaki, R.

    2008-02-01

    We have investigated a one-step method to fabricate a microstructure on a silica glass plate using laser-induced backside wet etching (LIBWE) upon irradiation with DPSS (diode-pumped solid state) lasers. Well-defined deep microtrenches without crack formations on a fused silica glass plate were fabricated by LIBWE method. As the laser beam of DPSS UV laser at a high repetition rate up to 5 - 100 kHz is scanned on the sample surface with the galvanometer controlled by a computer for flexible operations, galvanometer-based point scanning system is suitable for a rapid prototyping process according to electronic design data in the computer. The behavior of liquid ablation (explosive vaporization) was monitored by impulse pressure detection with a fast-response piezoelectric pressure gauge. LIBWE method is suitable for rapid prototyping and rapid manufacturing of surface microstructuing of silica glass as mask-less exposure system in a conventional atmospheric environment.

  8. The infrared spectra and laser damage threshold of the fused silica after megacoustic field assisted hydrofluoric-based etching

    NASA Astrophysics Data System (ADS)

    Li, Yuan; Yang, Ke; Yao, Caizhen; Wang, Zhiqiang; Yuan, Xiaodong; Yan, Hongwei; Ju, Xin; Yang, Liming

    2017-05-01

    The laser-induced damage of fused silica optics significantly restricts the output ability of large laser systems. Hydrofluoric (HF)-based etching is an effective processing to eliminate impurities and mitigate subsurface defects. Traditional polished fused silica samples were etched for different time in a HF-based etchant (2.3% HF and 11.4% NH4F) assisted by a 1.3 MHz megacoustic field. The laser-induced damage thresholds (LIDT) were measured by R-on-1 method, and fourier transform infrared absorption spectras of the samples were obtained. The results of the LIDT demonstrated that the LIDTs of the fused silica samples increased after megacoustic field assisted etching. The more surface materials were removed, the higher LIDT was obtained. The analysis of the infrared spectra illustrated that structural densification materials were removed during the etching, and thus the LIDT can be improved.

  9. Shear Bond Strength of an Etch-and-rinse Adhesive to Er:YAG Laser- and/or Phosphoric Acid-treated Dentin

    PubMed Central

    Davari, Abdolrahim; Sadeghi, Mostafa; Bakhshi, Hamid

    2013-01-01

    Background and aims. Er:YAG laser irradiation has been claimed to improve the adhesive properties of dentin; therefore, it has been proposed as an alternative to acid etching. The aim of this in vitro study was to investigate the shear bond strength of an etch-and-rinse adhesive system to dentin surfaces following Er:YAG laser and/or phosphoric acid etching. Materials and methods. The roots of 75 sound maxillary premolars were sectioned below the CEJ and the crowns were embedded in auto-polymerizing acrylic resin with the buccal surfaces facing up. The buccal surfaces were ground using a diamond bur and polished until the dentin was exposed; the samples were randomly divided into five groups (n=15) according to the surface treatment: (1) acid etching; (2) laser etching; (3) laser etching followed by acid etching; (4) acid etching followed by laser etching and (5) no acid etching and no laser etching (control group). Composite resin rods (Point 4, Kerr Co) were bonded to treated dentin surfaces with an etch-and-rise adhesive system (Optibond FL, Kerr Co) and light-cured.After storage for two weeks at 37°C and 100% humidity and then thermocycling, bond strength was measured with a Zwick Universal Testing Machine at a crosshead speed of 1 mm/min. Data was analyzed using parametric and non-parametric tests (P<0.05). Results. Mean shear bond strength for acid etching (20.1±1.8 MPa) and acid+laser (15.6±3.5 MPa) groups were significantly higher than those for laser+acid (15.6±3.5 MPa), laser etching (14.1±3.4 MPa) and control (8.1±2.1 MPa) groups. However, there were no significant differences between acid etching and acid+laser groups, and between laser+acid and laser groups. Conclusion. When the cavity is prepared by bur, it is not necessary to etch the dentin surface by Er:YAG laser following acid etching and acid etching after laser etching. PMID:23875083

  10. Acid resistance of erbium-doped yttrium aluminum garnet laser-treated and phosphoric acid-etched enamels.

    PubMed

    Kim, Jung-Ho; Kwon, Oh-Won; Kim, Hyung-Il; Kwon, Yong Hoon

    2006-11-01

    To compare the effects of erbium-doped yttrium aluminum garnet (Er:YAG) laser ablation and of phosphoric acid etching on the in vitro acid resistance of bovine enamel. Teeth were polished to make the surface flat. The polished enamel was either etched with 37% phosphoric acid for 30 seconds or ablated with a single 33 J/cm2 pulse from an Er:YAG laser. The control specimens were free from acid etching and laser ablation. Changes in crystal structure, dissolved mineral (calcium [Ca] and phosphorus [P]) contents, and calcium distribution in the enamel subsurface after a pH-cycling process were evaluated. After laser treatment, poor crystal structures improved without forming any new phases, such as tricalcium phosphates. Among the tested enamels, dissolved mineral contents were significantly different (P < .05). Er:YAG laser-treated enamels had the lowest mineral dissolution (Ca, 13.78 ppm; P, 6.33 ppm), whereas phosphoric acid-etched enamels had the highest (Ca, 15.90 ppm; P, 7.33 ppm). The reduction rate and reduced depth of calcium content along the subsurface were lowest in Er:YAG laser-treated enamels. The Er:YAG laser-treated enamels are more acid resistant to acid attack than phosphoric acid-etched enamels.

  11. Comparison of shear bond strength of composite resin to enamel surface with laser etching versus acid etching: An in vitro evaluation

    PubMed Central

    Hoshing, Upendra A; Patil, Suvarna; Medha, Ashish; Bandekar, Siddhesh Dattatray

    2014-01-01

    Introduction: The aim of the study is in vitro evaluation of the shear bond strength of composite resin bonded to enamel which is pretreated using acid etchant and Er,Cr:Ysgg. Materials and Methods: 40 extracted human teeth were divided in two groups of 20 each (Groups A and B). In Group A, prepared surface of enamel was etched using 37% phosphoric acid (Scotchbond, 3M). In Group B, enamel was surface treated by a an Er, Cr: YSGG laser system (Waterlase MD, Biolase Technology Inc., San Clemente, CA, USA) operating at a wavelength of 2,780 nm and having a pulse duration of 140-200 microsecond with a repetition rate of 20 Hz and 40 Hz. Bonding agent ((Scotchbond Multipurpose, 3M) was applied over the test areas on 20 samples of Groups A and B each, and light cured. Composite resin (Ceram X duo Nanoceramic restorative, Densply) was applied onto the test areas as a 3 × 3 mm diameter bid, and light cured. The samples were tested for shear bond strength. Results: Mean shear bond strength for acid-etched enamel (26.41 ± 0.66MPa, range 25.155 to 27.150 MPa) was significantly higher (P < 0.01) than for laser-etched enamel (16.23 ± 0.71MPa, range 15.233 to 17.334 MPa). Conclusions: For enamel surface, mean shear bond strength of bonded composite obtained after laser etching were significantly lower than those obtained after acid etching. PMID:25125842

  12. Micro-fabricated packed gas chromatography column based on laser etching technology.

    PubMed

    Sun, J H; Guan, F Y; Zhu, X F; Ning, Z W; Ma, T J; Liu, J H; Deng, T

    2016-01-15

    In this work, a micro packed gas chromatograph column integrated with a micro heater was fabricated by using laser etching technology (LET) for analyzing environmental gases. LET is a powerful tool to etch deep well-shaped channels on the glass wafer, and it is the most effective way to increase depth of channels. The fabricated packed GC column with a length of over 1.6m, to our best knowledge, which is the longest so far. In addition, the fabricated column with a rectangular cross section of 1.2mm (depth) × 0.6mm (width) has a large aspect ratio of 2:1. The results show that the fabricated packed column had a large sample capacity, achieved a separation efficiency of about 5800 plates/m and eluted highly symmetrical Gaussian peaks.

  13. Evaluation of surface topography of zirconia ceramic after Er:YAG laser etching.

    PubMed

    Turp, Volkan; Akgungor, Gokhan; Sen, Deniz; Tuncelli, Betul

    2014-10-01

    The aim of this study is to evaluate the effect of Erbium: yttrium-aluminum-garnet (Er:YAG) laser with different pulse lengths on the surface roughness of zirconia ceramic and airborne particle abrasion. Er:YAG laser treatment is expected to be an alternative surface treatment method for zirconia ceramics; however, the parameters and success of the application are not clear. One hundred and forty zirconia discs (diameter, 10 mm; thickness, 1.2 mm) were prepared by a computer-aided design and computer-aided manufacturing (CAD/CAM) system according to the manufacturer's instructions. Specimens were divided into 14 groups (n=10). One group was left as polished control, one group was air-particle abraded with Al2O3 particles. For the laser treatment groups, laser irradiation was applied at three different pulse energy levels (100, 200, and 300 mJ) and for each energy level at four different pulse lengths; 50, 100, 300, and 600 μs. Surface roughness was evaluated with an optical profilometer and specimens were evaluated with scanning electron microscopy (SEM). Data was analyzed with one way ANOVA and Tukey multiple comparison tests (α=0.05). For the 100 and 200 mJ laser etching groups, 50 and 100 μs laser duration resulted in significantly higher surface roughness compared with air-particle abrasion (p<0.05). The difference among Ra values of 300 μs, 600 μs, and air-particle abrasion groups were not statistically significant (p>0.05). For the 300 mJ laser etching groups; there was no statistically significant difference among the Ra values of 50 μs, 100 μs, 300 μs, 600 μs, and air-particle abrasion groups (p>0.05). In order to increase surface roughness and promote better bonding to resin luting agents, Er:YAG laser etching may be an alternative to air-particle abrasion for zirconia ceramics. However, high levels of pulse energy and longer pulse length may have an adverse effect on micromechanical locking properties, because of a

  14. Improvement of enamel bond strengths for conventional and resin-modified glass ionomers: acid-etching vs. conditioning*

    PubMed Central

    Zhang, Ling; Tang, Tian; Zhang, Zhen-liang; Liang, Bing; Wang, Xiao-miao; Fu, Bai-ping

    2013-01-01

    Objective: This study deals with the effect of phosphoric acid etching and conditioning on enamel micro-tensile bond strengths (μTBSs) of conventional and resin-modified glass ionomer cements (GICs/RMGICs). Methods: Forty-eight bovine incisors were prepared into rectangular blocks. Highly-polished labial enamel surfaces were either acid-etched, conditioned with liquids of cements, or not further treated (control). Subsequently, two matching pre-treated enamel surfaces were cemented together with one of four cements [two GICs: Fuji I (GC), Ketac Cem Easymix (3M ESPE); two RMGICs: Fuji Plus (GC), RelyX Luting (3M ESPE)] in preparation for μTBS tests. Pre-treated enamel surfaces and cement-enamel interfaces were analyzed by scanning electron microscopy (SEM). Results: Phosphoric acid etching significantly increased the enamel μTBS of GICs/RMGICs. Conditioning with the liquids of the cements produced significantly weaker or equivalent enamel μTBS compared to the control. Regardless of etching, RMGICs yielded stronger enamel μTBS than GICs. A visible hybrid layer was found at certain enamel-cement interfaces of the etched enamels. Conclusions: Phosphoric acid etching significantly increased the enamel μTBSs of GICs/RMGICs. Phosphoric acid etching should be recommended to etch the enamel margins before the cementation of the prostheses such as inlays and onlays, using GICs/RMGICs to improve the bond strengths. RMGICs provided stronger enamel bond strength than GICs and conditioning did not increase enamel bond strength. PMID:24190447

  15. Self-etch bonding agent beneath sealant: Bond strength for laser-irradiated enamel

    PubMed Central

    Borsatto, Maria Cristina; Giuntini, Jackelline de Lemes; Contente, Marta Maria Martins Giamatei; Gomes-Silva, Jaciara Miranda; Torres, Carolina Paes; Galo, Rodrigo

    2013-01-01

    Objectives: This study evaluated the in vitro shear bond strength (SBS) of a resin-based pit-and-fissure sealant (Fluroshield [F], Dentsply/Caulk) associated with either an etch-and-rinse (Adper Single Bond 2 [SB], 3M/ESPE) or a two-step self-etch adhesive system (Adper SE Plus [SE], 3M/ESPE) on Er: YAG laser-irradiated enamel. Materials and Methods: Seventeen sound third molar crowns were embedded in acrylic resin, and the mesial–distal enamel surfaces were flattened. The enamel sites were irradiated with a 2.94-μm wavelength Er: YAG laser (120 mJ, 4 Hz, noncontact mode/17 mm, 20 s). The specimens were randomly assigned to three groups according to the bonding technique: I - 37% phosphoric acid etching + SB + F; II - SE + F and III - F applied to acid-etched enamel, without an intermediate layer of bonding agent. In all of the groups, a 3-mm diameter enamel-bonding site was demarcated and the sealant cylinders were bonded. After 24 hours in distilled water, the shear bond strength was tested at a crosshead speed of 0.5 mm/minute. The data were analyzed by one-way ANOVA and Tukey's test. The debonded specimens were examined with a stereomicroscope to assess the failure modes. Results: The mean SBS values in MPa were I = 6.39 (±1.44); II = 9.50 (±2.79); and III = 5.26 (±1.82). No statistically significant differences were observed between groups I and III; SE/F presented a significantly higher SBS than that of the other groups (P = 0.001). With regard to the failure mode, groups I (65%) and II (75%) presented adhesive failures, while group III showed 50% adhesive failure. Cohesive failure did not occur. Conclusion: The application of the two-step self-etch bonding agent (Adper SE Plus) beneath the resin pit-and-fissure sealant placement resulted in a significantly higher bond strength for the Er:YAG laser-irradiated enamel. PMID:24926208

  16. Large scale, highly dense nanoholes on metal surfaces by underwater laser assisted hydrogen etching near nanocrystalline boundary

    NASA Astrophysics Data System (ADS)

    Lin, Dong; Zhang, Martin Yi; Ye, Chang; Liu, Zhikun; Liu, C. Richard; Cheng, Gary J.

    2012-03-01

    A new method to generate large scale and highly dense nanoholes is presented in this paper. By the pulsed laser irradiation under water, the hydrogen etching is introduced to form high density nanoholes on the surfaces of AISI 4140 steel and Ti. In order to achieve higher nanohole density, laser shock peening (LSP) followed by recrystallization is used for grain refinement. It is found that the nanohole density does not increase until recrystallization of the substructures after laser shock peening. The mechanism of nanohole generation is studied in detail. This method can be also applied to generate nanoholes on other materials with hydrogen etching effect.

  17. Bond strengths of orthodontic bracket after acid-etched, Er:YAG laser-irradiated and combined treatment on enamel surface.

    PubMed

    Lee, Bor-Shiunn; Hsieh, Tseng-Ting; Lee, Yuan-Ling; Lan, Wan-Hong; Hsu, Yao-Jeng; Wen, Ping-Han; Lin, Chun-Pin

    2003-10-01

    Laser ablation has been proposed as an alternative method to acid etching: however, previous studies have obtained contrasting results. The purpose of this study was to compare the bond strengths after acid etching, laser ablation, acid etching followed by laser ablation, and laser ablation followed by acid etching. Forty specimens were randomly assigned to one of the four groups. Two more specimens in each group did not undergo bond test and were prepared for observation with scanning electron microscope (SEM) after the four kinds of surface treatment. After the bond test, all specimens were inspected under the digital stereomicroscope and SEM to record the bond failure mode. Student's t-test results showed that the mean bond strength (13.0 +/- 2.4 N) of the laser group was not significantly different from that of the acid-etched group (11.8 +/- 1.8 N) (P > .05). However, this strength was significantly higher than that of the acid-etched then laser-ablated group (10.4 +/- 1.4 N) or that of the laser-ablated then acid-etched group (9.1 +/- 1.8 N). The failure modes occurred predominantly at the bracket-resin interface. Er:YAG laser ablation consumed less time compared with the acid-etching technique. Therefore, Er:YAG laser ablation can be an alternative tool to conventional acid etching.

  18. Chemically assisted ion beam etching of laser diode facets on nonpolar and semipolar orientations of GaN

    NASA Astrophysics Data System (ADS)

    Kuritzky, L. Y.; Becerra, D. L.; Saud Abbas, A.; Nedy, J.; Nakamura, S.; DenBaars, S. P.; Cohen, D. A.

    2016-07-01

    We demonstrate a vertical (<1° departure) and smooth (2.0 nm root mean square line-edge roughness (LER)) etch by chemically assisted Ar ion beam etching (CAIBE) in Cl2 chemistry that is suitable for forming laser diode (LD) facets on nonpolar and semipolar oriented III-nitride devices. The etch profiles were achieved with photoresist masks and optimized CAIBE chamber conditions including the platen tilt angle and Cl2 flow rate. Co-loaded studies showed similar etch rates of ˜60 nm min-1 for (20\\bar{2}\\bar{1}),(20\\bar{2}1), and m-plane orientations. The etched surfaces of LD facets on these orientations are chemically dissimilar (Ga-rich versus N-rich), but were visually indistinguishable, thus confirming the negligible orientation dependence of the etch. Continuous-wave blue LDs were fabricated on the semipolar (20\\bar{2}\\bar{1}) plane to compare CAIBE and reactive ion etch (RIE) facet processes. The CAIBE process resulted in LDs with lower threshold current densities due to reduced parasitic mirror loss compared with the RIE process. The LER, degree of verticality, and model of the 1D vertical laser mode were used to calculate a maximum uncoated facet reflection of 17% (94% of the nominal) for the CAIBE facet. The results demonstrate the suitability of CAIBE for forming high quality facets for high performance nonpolar and semipolar III-N LDs.

  19. Laser-induced back-side etching with liquid and the solid hydrocarbon absorber films of different thicknesses

    NASA Astrophysics Data System (ADS)

    Ehrhardt, M.; Lorenz, P.; Yunxiang, P.; Bayer, L.; Han, B.; Zimmer, K.

    2017-04-01

    Laser-induced backside wet and dry etching (LIBWE and LIBDE) are methods for high-quality surface patterning of transparent dielectrics that making use of an additional absorber material attached to the rear side that is ablated in a confined configuration. Due to the manifold of the involved processes, the mechanism of the etching process and the parameter influence on the material removal process are multifaceted and not fully understood yet. In the present paper, we investigate the influence of the confinement to the backside etching process by studying the impact of the thickness of the attached liquid or solid absorber within a range of 12-125 and 0.2-11.7 μm, respectively. It was found that for the liquid and solid absorbers, the etching rate increases with the thickness of the absorber layer and saturates exceeding a certain value, which depends on the used laser fluence. Moreover, the incubation of etching depends on the absorber thickness. The comparison of the etching results of a similar thickness of the liquid and the solid absorber layers shows that the phase of the absorber (liquid or solid) does not influence the back-side etching process. Time-resolved shadowgraph images of the process indicate that with higher absorber layer thickness, the interaction time and strength of the laser-induced processes at the sample surface increase. The results suggest that confinement of the rear side attached absorber ablation influences the impact of the laser-induced secondary processes to the strength of the material modifications and, therefore, the etching rate.

  20. Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching

    NASA Astrophysics Data System (ADS)

    de Boor, Johannes; Geyer, Nadine; Wittemann, Jörg V.; Gösele, Ulrich; Schmidt, Volker

    2010-03-01

    By combining laser interference lithography and metal-assisted etching we were able to produce arrays of silicon nanowires with uniform diameters as small as 65 nm and densities exceeding 2 × 107 mm - 2. The wires are single crystalline, vertically aligned, arranged in a square pattern and obey strict periodicity over several cm2. The applied technique allows for a tailoring of nanowire size and density. Using a controlled and scalable process to fabricate sub-100 nm silicon nanowires is an important step towards the realization of cost-effective electronic and thermoelectric devices.

  1. Thermal analysis of etched-well surface-emitting diode lasers

    SciTech Connect

    Nakwaski, Wlodzimierz; Osinski, Marek )

    1991-11-01

    A new self-consistent thermal-electrical model of etched-well GaAs/AlGaAs vertical-cavity surface-emitting lasers is developed. The model features a realistic distribution of heat sources and two-dimensional current- and heat-flux spreading. It is shown that the P-AlGaAs layer represents a major source of Joule heating that may easily exceed the active-region heating. A moderate increase of the P-AlGaAs layer doping is shown to be very effective in reducing the excessive heating. 8 refs.

  2. Size-dependent Fano Interaction in the Laser-etched Silicon Nanostructures

    PubMed Central

    2008-01-01

    Photo-excitation and size-dependent Raman scattering studies on the silicon (Si) nanostructures (NSs) prepared by laser-induced etching are presented here. Asymmetric and red-shifted Raman line-shapes are observed due to photo-excited Fano interaction in the quantum confined nanoparticles. The Fano interaction is observed between photo-excited electronic transitions and discrete phonons in Si NSs. Photo-excited Fano studies on different Si NSs show that the Fano interaction is high for smaller size of Si NSs. Higher Fano interaction for smaller Si NSs is attributed to the enhanced interference between photo-excited electronic Raman scattering and phonon Raman scattering.

  3. Patterning of graphene on silicon-on-insulator waveguides through laser ablation and plasma etching

    NASA Astrophysics Data System (ADS)

    Van Erps, Jürgen; Ciuk, Tymoteusz; Pasternak, Iwona; Krajewska, Aleksandra; Strupinski, Wlodek; Van Put, Steven; Van Steenberge, Geert; Baert, Kitty; Terryn, Herman; Thienpont, Hugo; Vermeulen, Nathalie

    2016-05-01

    We present the use of femtosecond laser ablation for the removal of monolayer graphene from silicon-on-insulator (SOI) waveguides, and the use of oxygen plasma etching through a metal mask to peel off graphene from the grating couplers attached to the waveguides. Through Raman spectroscopy and atomic force microscopy, we show that the removal of graphene is successful with minimal damage to the underlying SOI waveguides. Finally, we employ both removal techniques to measure the contribution of graphene to the loss of grating-coupled graphene-covered SOI waveguides using the cut-back method. This loss contribution is measured to be 0.132 dB/μm.

  4. Quantum cascade laser based monitoring of CF2 radical concentration as a diagnostic tool of dielectric etching plasma processes

    NASA Astrophysics Data System (ADS)

    Hübner, M.; Lang, N.; Zimmermann, S.; Schulz, S. E.; Buchholtz, W.; Röpcke, J.; van Helden, J. H.

    2015-01-01

    Dielectric etching plasma processes for modern interlevel dielectrics become more and more complex by the introduction of new ultra low-k dielectrics. One challenge is the minimization of sidewall damage, while etching ultra low-k porous SiCOH by fluorocarbon plasmas. The optimization of this process requires a deeper understanding of the concentration of the CF2 radical, which acts as precursor in the polymerization of the etch sample surfaces. In an industrial dielectric etching plasma reactor, the CF2 radical was measured in situ using a continuous wave quantum cascade laser (cw-QCL) around 1106.2 cm-1. We measured Doppler-resolved ro-vibrational absorption lines and determined absolute densities using transitions in the ν3 fundamental band of CF2 with the aid of an improved simulation of the line strengths. We found that the CF2 radical concentration during the etching plasma process directly correlates to the layer structure of the etched wafer. Hence, this correlation can serve as a diagnostic tool of dielectric etching plasma processes. Applying QCL based absorption spectroscopy opens up the way for advanced process monitoring and etching controlling in semiconductor manufacturing.

  5. A New Method to Modify Two-Dimensional Electron Gas Density by GaN Cap Etching

    NASA Astrophysics Data System (ADS)

    Li, Zhongda; Chow, T. Paul

    2013-08-01

    We have experimentally demonstrated a new method for modifying the two-dimensional electron density (2DEG) at the AlGaN/GaN interface by etching of the GaN cap layer on top of the AlGaN. GaN MOS capacitors have been fabricated on samples with partially or fully etched GaN cap, and the 2DEG density has been extracted. The results show a linear relation between the 2DEG density and the thickness of the GaN cap being etched. We have also fabricated van der Pauw structures and obtained the 2DEG density using Hall measurements, and the results are consistent with that from the GaN MOS capacitors.

  6. Nanosecond laser-induced back side wet etching of fused silica with a copper-based absorber liquid

    NASA Astrophysics Data System (ADS)

    Lorenz, Pierre; Zehnder, Sarah; Ehrhardt, Martin; Frost, Frank; Zimmer, Klaus; Schwaller, Patrick

    2014-03-01

    Cost-efficient machining of dielectric surfaces with high-precision and low-roughness for industrial applications is still challenging if using laser-patterning processes. Laser induced back side wet etching (LIBWE) using UV laser pulses with liquid heavy metals or aromatic hydrocarbons as absorber allows the fabrication of well-defined, nm precise, free-form surfaces with low surface roughness, e.g., needed for optical applications. The copper-sulphatebased absorber CuSO4/K-Na-Tartrate/NaOH/formaldehyde in water is used for laser-induced deposition of copper. If this absorber can also be used as precursor for laser-induced ablation, promising industrial applications combining surface structuring and deposition within the same setup could be possible. The etching results applying a KrF excimer (248 nm, 25 ns) and a Nd:YAG (1064 nm, 20 ns) laser are compared. The topography of the etched surfaces were analyzed by scanning electron microscopy (SEM), white light interferometry (WLI) as well as laser scanning microscopy (LSM). The chemical composition of the irradiated surface was studied by energy-dispersive X-ray spectroscopy (EDX) and Fourier transform infrared spectroscopy (FT-IR). For the discussion of the etching mechanism the laser-induced heating was simulated with finite element method (FEM). The results indicate that the UV and IR radiation allows micro structuring of fused silica with the copper-based absorber where the etching process can be explained by the laser-induced formation of a copper-based absorber layer.

  7. Fabrication of porous microrings via laser printing and ion-beam post-etching

    NASA Astrophysics Data System (ADS)

    Syubaev, S.; Nepomnyashchiy, A.; Mitsai, E.; Pustovalov, E.; Vitrik, O.; Kudryashov, S.; Kuchmizhak, A.

    2017-08-01

    Pulsed-laser dry printing of noble-metal microrings with a tunable internal porous structure, which can be revealed via an ion-beam etching post-procedure, was demonstrated. The abundance and average size of the pores inside the microrings were shown to be tuned in a wide range by varying the incident pulse energy and a nitrogen doping level controlled in the process of magnetron deposition of the gold film in the appropriate gaseous environment. The fabricated porous microrings were shown to provide many-fold near-field enhancement of incident electromagnetic fields, which was confirmed by mapping of the characteristic Raman band of a nanometer-thick covering layer of Rhodamine 6G dye molecules and supporting finite-difference time-domain calculations. The proposed laser-printing/ion-beam etching approach is demonstrated to be a unique tool aimed at designing and fabricating multifunctional plasmonic structures and metasurfaces for spectroscopic bioidentification based on surface-enhanced infrared absorption, Raman scattering, and photoluminescence detection schemes.

  8. Laser etching causing fatigue fracture at the neck-shoulder junction of an uncemented femoral stem: A case report.

    PubMed

    Jang, Bob; Kanawati, Andrew; Brazil, Declan; Bruce, Warwick

    2013-01-01

    Fatigue fracture of a femoral component in total hip arthroplasty is a rare occurrence but well documented in the literature. It is understood that proximal loosing of a femoral stem with a well fixed stem distally will result in cantilever bending and eventual fatigue fracture of the stem. Other factors which may potentiate a fatigue fracture are material design, implant positioning, and patient characteristics. More recently, laser etching on the femoral neck of an implant has resulted in fatigue fracture. We report a case of a fatigue fracture at the neck-shoulder junction in a well fixed, uncemented, femoral component due to laser etching in the region of high tensile stress.

  9. Non-uniform DFB-surface-etched gratings for enhanced performance high power, high brightness broad area lasers

    NASA Astrophysics Data System (ADS)

    Decker, J.; Fricke, J.; Maaßdorf, A.; Erbert, G.; Tränkle, G.; Crump, P.

    2017-02-01

    Monolithic spectral stabilization is demonstrated in narrow-stripe broad-area lasers (NBA) with high power (5W), conversion efficiency (50%) and high brightness, by using optimized high-order surface-etched DFB gratings. However, surface etched gratings introduce a high index contrast into the semiconductor, leading to the scattering losses increasing rapidly with groove etch depth, limiting efficiency and yield. We therefore review progress in the exploitation of novel, non-uniform grating configurations for improved performance. Devices with non-uniform gratings whose groove etch depth decreases toward the front facet (apodized grating) are shown to operate with enhanced spectrally stable power (6W) compared to devices with uniform gratings.

  10. Laser ablation threshold and etch rate comparison between the ultrafast Yb fiber-based FCPA laser and a Ti:sapphire laser for various materials

    NASA Astrophysics Data System (ADS)

    Bovatsek, James M.; Shah, Lawrence; Arai, Alan Y.; Uehara, Yuzuru

    2004-10-01

    Ti:Sapphire lasers remain the most widely used utlrafast laser. However, precise optical alignment and environmental control are necessary for continuous, long-term stable operatoin of the laser. IMRA's FCPA laser is an air-cooled, Yb fiber-based ultrafast laser designed to operate in an industrial environment and provide a stable, high-quality laser beam. In this work, the micromachining performance of the FCPA laser is directly compared with a conventional Ti:Sapphire regenerative amplifier laser. An experimental study was conducted to determine the ablation threshold and etch rate for a variety of materials (including metals, semiconductors, and dielectrics). The materials chosen for the experiments cover a wide range of optical, mechanical and physical properties. Similar focusing conditions were used for both lasers in order to ensure that any differences in the results are primarily due to the different characteristics of each laser. For materials with a relatively low ablation threshold, the full energy of the Ti:Sapphire laser is not needed. Furthermore, it is near the ablation threshold where ultrafast laser processing provides the benefit of minimal thermal damage to the surrounding material. Although the relatively low pulse energy of the FCPA limits its ability to ablate some harder materials, its high repetition rate increases the material processing speed and its good beam quality and stability facilitates tight, efficient focusing for precise machining of small features.

  11. Laser marking on soda-lime glass by laser-induced backside wet etching with two-beam interference

    NASA Astrophysics Data System (ADS)

    Nakazumi, Tomoka; Sato, Tadatake; Narazaki, Aiko; Niino, Hiroyuki

    2016-09-01

    For crack-free marking of glass materials, a beam-scanning laser-induced backside wet etching (LIBWE) process by a beam spot with a fine periodic structure was examined. The fine periodic structure was produced within a beam spot by means of a Mach-Zehnder interferometer incorporated to the optical setup for the beam-scanning LIBWE. A fine structure with a period of 9 µm was observed within the microstructures with a diameter of ca. 40 µm fabricated by a laser shot under double-beam irradiation, and they could be homogeneously fabricated within an area of 800  ×  800 µm. The area filled with the microstructures, including fine periodic structures, could be observed in high contrast under a diffuse, on-axis illumination that was used in commercial QR code readers.

  12. Smooth and selective photo-electrochemical etching of heavily doped GaN:Si using a mode-locked 355 nm microchip laser

    NASA Astrophysics Data System (ADS)

    Lee, SeungGeun; Mishkat-Ul-Masabih, Saadat; Leonard, John T.; Feezell, Daniel F.; Cohen, Daniel A.; Speck, James S.; Nakamura, Shuji; DenBaars, Steven P.

    2017-01-01

    We investigate the photo-electrochemical (PEC) etching of Si-doped GaN samples grown on nonpolar GaN substrates, using a KOH/K2S2O8 solution and illuminated by a Xe arc lamp or a Q-switched 355 nm laser. The etch rate with the arc lamp decreased as the doping concentration increased, and the etching stopped for concentrations above 7.7 × 1018 cm-3. The high peak intensity of the Q-switched laser extended the etchable concentration to 2.4 × 1019 cm-3, with an etch rate of 14 nm/min. Compositionally selective etching was demonstrated, with an RMS surface roughness of 1.6 nm after etching down to an n-Al0.20Ga0.80N etch stop layer.

  13. Shear bond strength of resin cement to an acid etched and a laser irradiated ceramic surface

    PubMed Central

    Motro, Pelin Fatma Karagoz; Yurdaguven, Haktan

    2013-01-01

    PURPOSE To evaluate the effects of hydrofluoric acid etching and Er,Cr:YSGG laser irradiation on the shear bond strength of resin cement to lithium disilicate ceramic. MATERIALS AND METHODS Fifty-five ceramic blocks (5 mm × 5 mm × 2 mm) were fabricated and embedded in acrylic resin. Their surfaces were finished with 1000-grit silicon carbide paper. The blocks were assigned to five groups: 1) 9.5% hydrofluoric-acid etching for 60 s; 2-4), 1.5-, 2.5-, and 6-W Er,Cr:YSGG laser applications for 60 seconds, respectively; and 5) no treatment (control). One specimen from each group was examined using scanning electron microscopy. Ceramic primer (Rely X ceramic primer) and adhesive (Adper Single Bond) were applied to the ceramic surfaces, followed by resin cement to bond the composite cylinders, and light curing. Bonded specimens were stored in distilled water at 37℃ for 24 hours. Shear bond strengths were determined by a universal testing machine at 1 mm/min crosshead speed. Data were analyzed using Kruskal-Wallis and Mann-Whitney U-tests (α=0.05). RESULTS Adhesion was significantly stronger in Group 2 (3.88 ± 1.94 MPa) and Group 3 (3.65 ± 1.87 MPa) than in Control group (1.95 ± 1.06 MPa), in which bonding values were lowest (P<.01). No significant difference was observed between Group 4 (3.59 ± 1.19 MPa) and Control group. Shear bond strength was highest in Group 1 (8.42 ± 1.86 MPa; P<.01). CONCLUSION Er,Cr:YSGG laser irradiation at 1.5 and 2.5 W increased shear bond strengths between ceramic and resin cement compared with untreated ceramic surfaces. Irradiation at 6 W may not be an efficient ceramic surface treatment technique. PMID:23755333

  14. Micropatterning microlens arrays fabricated by a femtosecond laser wet etch process

    NASA Astrophysics Data System (ADS)

    Wei, Yang; Yang, Qing; Bian, Hao; Chen, Feng

    2017-02-01

    Microlens arrays with specially required micropatterns are highly desirable for digital optical processors, microimaging systems, optical photolithography as well as various biomedical imaging and detecting applications. However, realization of such devices efficiently remains technically challenging. Here, a facile and efficient route for large-area microlens arrays (MLAs) with programmable micropatterns is demonstrated. The fabrication process involves a femtosecond laser wet etch process combined with the replication process of hot embossing. Special arranged microlens arrays, including a doublet microlens array, a three-microlens group array, a four-microlens group array, and a six-petallike microlens array as examples, were fabricated by this method. The fabricated MLAs exhibit excellent surface morphology quality and optical imaging properties. This presented technique provides an efficient way to flexibly design the size, shape and the arrangement of the MLAs by adjusting the process parameters such as the pulse energy, the number of shots etching time and the distribution of ablation-induced craters and Programming arrangement.

  15. Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation

    NASA Astrophysics Data System (ADS)

    Li, Xiaowei; Xie, Qian; Jiang, Lan; Han, Weina; Wang, Qingsong; Wang, Andong; Hu, Jie; Lu, Yongfeng

    2017-05-01

    In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (˜2 μm) to nanometer (˜313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.

  16. Comparison of bond strength and surface morphology of dental enamel for acid and Nd-YAG laser etching

    NASA Astrophysics Data System (ADS)

    Parmeswearan, Diagaradjane; Ganesan, Singaravelu; Ratna, P.; Koteeswaran, D.

    1999-05-01

    Recently, laser pretreatment of dental enamel has emerged as a new technique in the field of orthodontics. However, the changes in the morphology of the enamel surface is very much dependent on the wavelength of laser, emission mode of the laser, energy density, exposure time and the nature of the substance absorbing the energy. Based on these, we made a comparative in vitro study on laser etching with acid etching with reference to their bond strength. Studies were conducted on 90 freshly extracted, non carious, human maxillary or mandibular anteriors and premolars. Out of 90, 60 were randomly selected for laser irradiation. The other 30 were used for conventional acid pretreatment. The group of 60 were subjected to Nd-YAG laser exposure (1060 nm, 10 Hz) at differetn fluences. The remaining 30 were acid pretreated with 30% orthophosphoric acid. Suitable Begg's brackets were selected and bound to the pretreated surface and the bond strength were tested using Instron testing machine. The bond strength achieved through acid pretreatment is found to be appreciably greater than the laser pretreated tooth. Though the bond strength achieved through the acid pretreated tooth is found to be significantly greater than the laser pretreated specimens, the laser pretreatement is found to be successful enough to produce a clinically acceptable bond strength of > 0.60 Kb/mm. Examination of the laser pre-treated tooth under SEM showed globule formation which may produce the mechanical interface required for the retention of the resin material.

  17. Large-scale high quality glass microlens arrays fabricated by laser enhanced wet etching.

    PubMed

    Tong, Siyu; Bian, Hao; Yang, Qing; Chen, Feng; Deng, Zefang; Si, Jinhai; Hou, Xun

    2014-11-17

    Large-scale high quality microlens arrays (MLAs) play an important role in enhancing the imaging quality of CCD and CMOS as well as the light extraction efficiency of LEDs and OLEDs. To meet the requirement in MLAs' wide application areas, a rapid fabrication method to fabricate large-scale MLAs with high quality, high fill factor and high uniformity is needed, especially on the glass substrate. In this paper, we present a simple and cost-efficient approach to the development of both concave and convex large-scale microlens arrays (MLAs) by using femtosecond laser wet etching method and replication technique. A large-scale high quality square-shaped microlens array with 512 × 512 units was fabricated.The unit size is 20 × 20 μm² on the whole scale of 1 × 1 cm². Its perfect uniformity and optical performance are demonstrated.

  18. Laser ablation- and plasma etching-based patterning of graphene on silicon-on-insulator waveguides.

    PubMed

    Van Erps, Jürgen; Ciuk, Tymoteusz; Pasternak, Iwona; Krajewska, Aleksandra; Strupinski, Wlodek; Van Put, Steven; Van Steenberge, Geert; Baert, Kitty; Terryn, Herman; Thienpont, Hugo; Vermeulen, Nathalie

    2015-10-05

    We present a new approach to remove monolayer graphene transferred on top of a silicon-on-insulator (SOI) photonic integrated chip. Femtosecond laser ablation is used for the first time to remove graphene from SOI waveguides, whereas oxygen plasma etching through a metal mask is employed to peel off graphene from the grating couplers attached to the waveguides. We show by means of Raman spectroscopy and atomic force microscopy that the removal of graphene is successful with minimal damage to the underlying SOI waveguides. Finally, we employ both removal techniques to measure the contribution of graphene to the loss of grating-coupled graphene-covered SOI waveguides using the cut-back method.

  19. Formation of 300 nm period pore arrays by laser interference lithography and electrochemical etching

    NASA Astrophysics Data System (ADS)

    Liu, J.; Kleimann, P.; Laffite, G.; Jamois, C.; Orobtchouk, R.

    2015-02-01

    This paper highlights that combining laser interference lithography and electrochemical etching is a cost-effective, efficient method to realize periodic nanopore arrays in silicon with lattice pitch as small as 300 nm on centimeter-scale substrates. The fabrication of wide-area and high aspect ratio 2D pore arrays with 250 nm diameter and 5 μm depth is demonstrated. All the steps of the process have been optimized to achieve vertical sidewalls with 50 nm thickness, providing pore arrays with aspect ratio of 100 on n-type silicon substrates over an area of 2 × 2 cm2. These results constitute a technological advance in the realization of ordered pore arrays in silicon with very small lattice parameters, with impact in biotechnology, energy harvesting, or sensors.

  20. Femtosecond laser structuring of silver-containing glass: Silver redistribution, selective etching, and surface topology engineering

    SciTech Connect

    Desmoulin, Jean-Charles; Petit, Yannick; Cardinal, Thierry; Canioni, Lionel; Dussauze, Marc; Lahaye, Michel; Gonzalez, Hernando Magallanes; Brasselet, Etienne

    2015-12-07

    Femtosecond direct laser writing in silver-containing phosphate glasses allows for the three-dimensional (3D) implementation of complex photonic structures. Sample translation along or perpendicular to the direction of the beam propagation has been performed, which led to the permanent formation of fluorescent structures, either corresponding to a tubular shape or to two parallel planes at the vicinity of the interaction voxel, respectively. These optical features are related to significant modifications of the local material chemistry. Indeed, silver depletion areas with a diameter below 200 nm were evidenced at the center of the photo-produced structures while photo-produced luminescence properties are attributed to the formation of silver clusters around the multiphoton interaction voxel. The laser-triggered oxidation-reduction processes and the associated photo-induced silver redistribution are proposed to be at the origin of the observed original 3D luminescent structures. Thanks to such material structuring, surface engineering has been also demonstrated. Selective surface chemical etching of the glass has been obtained subsequently to laser writing at the location of the photo-produced structures, revealing features with nanometric depth profiles and radial dimensions strongly related to the spatial distributions of the silver clusters.

  1. Fabrication of narrow-striped InAs/GaAs quantum dot laser with wet etching technique

    NASA Astrophysics Data System (ADS)

    Li, S. G.; Gong, Q.; Cao, C. F.; Wang, X. Z.; Xia, L. Z.; Yan, J. Y.; Wang, Y.

    2013-07-01

    An InAs/GaAs quantum dot laser, fabricated with a narrow-striped width of 6 μm by a wet etching technique, is reported. The etching solutions are composed of three components, i.e. phosphoric acid, hydrogen peroxide, and deionized water. We observed that the unavoidable undercutting was changed with the ratio of etching solution in the GaAs materials. By taking a suitable ratio of etching solution, good performance of quantum dot laser with a size of 6 μm × 700 μm was achieved for fabrication at room temperature. Under continuous wave mode, the lasing wavelength exhibited a single mode, which is located in the region of 1051 nm. In contrast, multimode lasing with a series of non-lasing gaps appeared and the spectra were gradually broadened to the high energy side by increasing the injection current. The laser has one facet power more than 22 mW, with a slope efficiency of 140 mW/A, just a little above threshold current.

  2. Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF 2 : Enhanced Reaction Rate and Precursor Transport

    SciTech Connect

    Noh, J. H.; Fowlkes, J. D.; Timilsina, R.; Stanford, M. G.; Lewis, B. B.; Rack, P. D.

    2015-01-28

    We introduce a laser-assisted focused electron-beam-induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing; we do this in order to enhance the etch rate of electron-beam-induced etching. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. Moreover, the evolution of the etching process is correlated to in situ stage current measurements and scanning electron micrographs as a function of time. Finally, the increased etch rate is attributed to photothermally enhanced Ti–F reaction and TiF4 desorption and in some regimes enhanced XeF2 surface diffusion to the reaction zone.

  3. Pulsed Laser-Assisted Focused Electron-Beam-Induced Etching of Titanium with XeF 2 : Enhanced Reaction Rate and Precursor Transport

    DOE PAGES

    Noh, J. H.; Fowlkes, J. D.; Timilsina, R.; ...

    2015-01-28

    We introduce a laser-assisted focused electron-beam-induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing; we do this in order to enhance the etch rate of electron-beam-induced etching. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. Moreover, the evolution of the etching process is correlated to in situ stage current measurements and scanning electron micrographs as a function of time. Finally, the increased etch rate is attributed to photothermally enhancedmore » Ti–F reaction and TiF4 desorption and in some regimes enhanced XeF2 surface diffusion to the reaction zone.« less

  4. Pulsed laser-assisted focused electron-beam-induced etching of titanium with XeF2: enhanced reaction rate and precursor transport.

    PubMed

    Noh, J H; Fowlkes, J D; Timilsina, R; Stanford, M G; Lewis, B B; Rack, P D

    2015-02-25

    In order to enhance the etch rate of electron-beam-induced etching, we introduce a laser-assisted focused electron-beam-induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. The evolution of the etching process is correlated to in situ stage current measurements and scanning electron micrographs as a function of time. The increased etch rate is attributed to photothermally enhanced Ti-F reaction and TiF4 desorption and in some regimes enhanced XeF2 surface diffusion to the reaction zone.

  5. An analysis of the shear strength of the bond between enamel and porcelain laminate veneers with different etching systems: acid and Er,Cr:YSGG laser separately and combined.

    PubMed

    Dundar, Berivan; Guzel, Kahraman Gündüz

    2011-11-01

    Conditioning of the enamel surface is now an accepted and widely applied technique used to improve retention in porcelain laminate veneer restorations. The aim of this study was to evaluate strength of the bond between porcelain laminate veneers and tooth surfaces etched with acid and laser, separately and together. The teeth studied comprised 60 incisors extracted for periodontal reasons. These were divided into four groups according to etching method: group 1, acid etching alone; group 2, acid etching followed by laser etching; group 3, laser etching followed by acid etching; group 4, laser etching alone. The teeth were etched with 37% phosphoric acid and a Er,Cr:YSGG laser system. In addition, 60 IPS Empress II cylindrical blocks 2 mm in height and 5 mm in diameter were also prepared for the etched tooth surface. These blocks were bonded to the teeth with dual cured resin cement and shear tests were then performed. After the shear tests, Scanning electron microscopy images of the tooth surfaces were obtained at a magnification of ×3,800. Etching with acid alone yielded the highest mean value of bond shear strength (15.4±3.8 MPa), while laser etching followed by acid etching gave the lowest mean value (11.5±4.6 MPa). The mean values of the bond shear strength for acid etching followed by laser etching and laser etching alone were 13.8±3.9 MPa and 12.8±4.6 MPa, respectively. Statistical analysis revealed no significant differences between the groups. The results suggest that laser etching is easy to apply and less time-consuming. They further suggest that the order in which the acid and laser are applied in combined treatments is important.

  6. Virus passage through track-etch membranes modified by salinity and a nonionic surfactant.

    PubMed

    Lytle, C D; Routson, L B; Jain, N B; Myers, M R; Green, B L

    1999-06-01

    Why do viruses sometimes not pass through larger pores in track-etch filters? Increasing the salinity (0.8 to 160 mM Na+) decreased phiX174 and PRD1 passage through track-etch polycarbonate membranes (sodium dodecyl sulfate coated but not polyvinylpyrrolidone coated) and PRD1 passage through polyester membranes. Undiminished passage when 0.1% Tween 80 was added implied that nonionic virus adsorption occurred and indicated that high levels of salinity decreased virus passage by decreasing electrostatic repulsion that prevented adsorption.

  7. Virus Passage through Track-Etch Membranes Modified by Salinity and a Nonionic Surfactant

    PubMed Central

    Lytle, C. David; Routson, Licia B.; Jain, Nisha B.; Myers, Matthew R.; Green, Barbara L.

    1999-01-01

    Why do viruses sometimes not pass through larger pores in track-etch filters? Increasing the salinity (0.8 to 160 mM Na+) decreased φX174 and PRD1 passage through track-etch polycarbonate membranes (sodium dodecyl sulfate coated but not polyvinylpyrrolidone coated) and PRD1 passage through polyester membranes. Undiminished passage when 0.1% Tween 80 was added implied that nonionic virus adsorption occurred and indicated that high levels of salinity decreased virus passage by decreasing electrostatic repulsion that prevented adsorption. PMID:10347078

  8. Planar waveguide solar concentrator with couplers fabricated by laser-induced backside wet etching

    NASA Astrophysics Data System (ADS)

    Zhang, Nikai

    . The fabrication of the etched holes in the glass is proposed to be based on a self-aligned process using a laser-induced backside etching (LIBWE) method, which is discussed in this project and its feasibility is examined. The role of different parameters to the concentration level and the optical efficiency of the CPV system are studied by simulations in ZEMAX (which is a leading optical analysis/design software) using non-sequential ray tracing. The optical efficiency of this design under different light concentration level is studied and discussed. The main contributions of this research consist of a new design of a waveguide-based CPV system which can be made entirely of glass by a low-cost glass fabrication method, and a feasibility study in terms of critical fabrication steps and optical performance.

  9. InGaN/GaN DFB laser diodes at 434 nm with deeply etched sidewall gratings

    NASA Astrophysics Data System (ADS)

    Slight, Thomas J.; Odedina, Opeoluwa; Meredith, Wyn; Docherty, Kevin E.; Kelly, Anthony E.

    2016-02-01

    We report on deeply etched sidewall grating DFB lasers in the InGaN/GaN material system emitting at a single wavelength around 434 nm. GaN lasers have a wide range of applications in communications, displays and storage. The availability of a single wavelength device with a good side mode suppression ratio (SMSR) would allow further applications to be addressed such as sources for laser cooling and Fraunhofer line operation for solar background free communications. Sidewall etched gratings have the advantage of fabrication with no need for overgrowth and have been demonstrated in a range of other material systems and wavelengths. Importantly for GaN based devices, this design has the potential to minimise fabrication induced damage to the epi structure. We investigated two laser designs, one with 80 % duty-cycle 3rd order gratings and another with 39th order partial gratings. Simulation of the 2D waveguide sections was carried out to find the optimal grating width. For fabrication, the laser ridge and gratings were patterned in a single step using electron beam lithography and ICP etched to a depth of 500 nm. Contact metal was deposited and the sample thinned and cleaved into 1 mm long cavities. The as-cleaved 3rd order lasers emit in the pulsed regime with a SMSR of 20 dB and a peak single-mode output power of 40 mW. The output power is similar to that of parallel processed FP lasers. The 39th order lasers also exhibit narrow spectral width at an output power of 10 mW.

  10. Evaluation of the Bond Strength of Resin Cements Used to Lute Ceramics on Laser-Etched Dentin

    PubMed Central

    Duzdar, Lale; Oksuz, Mustafa; Tanboga, Ilknur

    2014-01-01

    Abstract Objective: The purpose of this study was to investigate the shear bond strength (SBS) of two different adhesive resin cements used to lute ceramics on laser-etched dentin. Background data: Erbium, chromium: yttrium, scandium, gallium, garnet (Er,Cr:YSGG) laser irradiation has been claimed to improve the adhesive properties of dentin, but results to date have been controversial, and its compatibility with existing adhesive resin cements has not been conclusively determined. Materials and methods: Two adhesive cements, one “etch-and-rinse” [Variolink II (V)] and one “self-etch” [Clearfil Esthetic Cement (C)] luting cement, were used to lute ceramic blocks (Vita Celay Blanks, Vita) onto dentin surfaces. In total, 80 dentin specimens were distributed randomly into eight experimental groups according to the dentin surface-etching technique used Er,Cr:YSGG laser and Er:YAG laser: (1) 37% orthophosphoric acid+V (control group), (2) Er,Cr:YSGG laser+V, (3) Er,Cr:YSGG laser+acid+V, (4) Er:YAG laser+V, (5) Er:YAG laser+acid+V, (6) C, (7) Er,Cr:YSGG laser+C, and (8) Er:YAG laser+C. Following these applications, the ceramic discs were bonded to prepared surfaces and were shear loaded in a universal testing machine until fracture. SBS was recorded for each group in MPa. Shear test values were evaluated statistically using the Mann–Whitney U test. Results: No statistically significant differences were evident between the control group and the other groups (p>0.05). The Er,Cr:YSGG laser+A+V group demonstrated significantly higher SBS than did the Er,Cr:YSGG laser+V group (p=0.034). The Er,Cr:YSGG laser+C and Er:YAG laser+C groups demonstrated significantly lower SBS than did the C group (p<0.05). Conclusions: Dentin surfaces prepared with lasers may provide comparable ceramic bond strengths, depending upon the adhesive cement used. PMID:24992276

  11. Effect of acid etching duration on tensile bond strength of composite resin bonded to erbium:yttrium-aluminium-garnet laser-prepared dentine. Preliminary study.

    PubMed

    Chousterman, M; Heysselaer, D; Dridi, S M; Bayet, F; Misset, B; Lamard, L; Peremans, A; Nyssen-Behets, C; Nammour, S

    2010-11-01

    The purpose of this study was to compare the tensile bond strength of composite resin bonded to erbium:yttrium-aluminium-garnet (Er:YAG) laser-prepared dentine after different durations of acid etching. The occlusal third of 68 human third molars was removed in order to expose the dentine surface. The teeth were randomly divided into five groups: group B (control group), prepared with bur and total etch system with 15 s acid etching [37% orthophosphoric acid (H(3)PO(4))]; group L15, laser photo-ablated dentine (200 mJ) (laser irradiation conditions: pulse duration 100 micros, air-water spray, fluence 31.45 J/ cm(2), 10 Hz, non-contact hand pieces, beam spot size 0.9 mm, irradiation speed 3 mm/s, and total irradiation time 2 x 40 s); group L30, laser prepared, laser conditioned and 30 s acid etching; group L60, laser prepared, laser conditioned and 60 s acid etching; group L90, laser prepared, laser conditioned and 90 s acid etching. A plot of composite resin was bonded onto each exposed dentine and then tested for tensile bond strength. The values obtained were statistically analysed by analysis of variance (ANOVA) coupled with the Tukey-Kramer test at the 95% level. A 90 s acid etching before bonding showed the best bonding value (P < 0.05) when compared with all the other groups including the control group. There is no significance difference between other groups, nor within each group and the control group. There was a significant increase in tensile bond strength of the samples acid etched for 90 s.

  12. Mask-free construction of three-dimensional silicon structures by dry etching assisted gray-scale femtosecond laser direct writing

    NASA Astrophysics Data System (ADS)

    Liu, Xue-Qing; Yu, Lei; Chen, Qi-Dai; Sun, Hong-Bo

    2017-02-01

    A mask-free micro/nano fabrication method is proposed for constructing arbitrary gradient height structures on silicon, combining gray-scale femtosecond laser direct writing (GS-FsLDW) with subsequent dry etching. Arbitrary two-dimensional patterns with a gradient concentration of oxygen atoms can be fabricated on the surface of undoped silicon wafer by FsLDW in air. After dry etching, various three-dimensional (3D) gradient height silicon structures are fabricated by controlling the laser power, scanning step, etching time, and etching power. As an example, a well-defined 3D Fresnel zone plate was fabricated on silicon wafer, which shows excellent focusing and imaging properties. The combination of high precision from dry etching and 3D fabrication ability on non-planar substrates of FsLDW, may broaden its applications in microelectronics, micro-optics, and microelectromechanical systems.

  13. Silicon structuring by etching with liquid chlorine and fluorine precursors using femtosecond laser pulses

    SciTech Connect

    Radu, C.; Simion, S.; Zamfirescu, M.; Ulmeanu, M.; Enculescu, M.; Radoiu, M.

    2011-08-01

    The aim of this study is to investigate the micrometer and submicrometer scale structuring of silicon by liquid chlorine and fluorine precursors with 200 fs laser pulses working at both fundamental (775 nm) and frequency doubled (387 nm) wavelengths. The silicon surface was irradiated at normal incidence by immersing the Si (111) substrates in a glass container filled with liquid chlorine (CCl{sub 4}) and fluorine (C{sub 2}Cl{sub 3}F{sub 3}) precursors. We report that silicon surfaces develop an array of spikes with single step irradiation processes at 775 nm and equally at 387 nm. When irradiating the Si surface with 400 pulses at 330 mJ/cm{sup 2} laser fluence and a 775 nm wavelength, the average height of the formed Si spikes in the case of fluorine precursors is 4.2 {mu}m, with a full width at half maximum of 890 nm. At the same irradiation wavelength chlorine precursors develop Si spikes 4 {mu}m in height and with a full width at half maximum of 2.3 {mu}m with irradiation of 700 pulses at 560 mJ/cm{sup 2} laser fluence. Well ordered areas of submicrometer spikes with an average height of about 500 nm and a width of 300 nm have been created by irradiation at 387 nm by chlorine precursors, whereas the fluorine precursors fabricate spikes with an average height of 700 nm and a width of about 200 nm. Atomic force microscopy and scanning electron microscopy of the surface show that the formation of the micrometer and sub-micrometer spikes involves a combination of capillary waves on the molten silicon surface and laser-induced etching of silicon, at both 775 nm and 387 nm wavelength irradiation. The energy-dispersive x-ray measurements indicate the presence of chlorine and fluorine precursors on the structured surface. The fluorine precursors create a more ordered area of Si spikes at both micrometer and sub-micrometer scales. The potential use of patterned Si substrates with gradient topography as model scaffolds for the systematic exploration of the role of 3D

  14. Laser-induced particle size tuning and structural transformations in germanium nanoparticles prepared by stain etching and colloidal synthesis route

    NASA Astrophysics Data System (ADS)

    Karatutlu, Ali; Little, William; Ersoy, Osman; Zhang, Yuanpeng; Seker, Isa; Sapelkin, Andrei

    2015-12-01

    In this study, with the aid of Raman measurements, we have observed transformations in small (˜3 nm and ˜10 nm) free-standing Ge nanoparticles under laser light exposure. The nanoparticles were obtained by the chemical stain etching of a monocrystalline Ge wafer and of Ge powder and by colloidal synthesis route. We found that the transformation path depends on laser power and exposure time. At relatively low values of the laser power (2 mW) over a period of 100 min, the Raman signal indicates transformation of the sample from a nanocrystaline to bulk-like state, followed by partial oxidation and finally a conversion of the entire sample into alpha-quartz type GeO2. However, when the laser power is set at 60 mW, we observed a heat release during an explosive crystallization of the nanocrystalline material into bulk Ge without noticeable signs of oxidation. Together with the transmission electron microscopy measurements, these results suggest that the chemical stain etching method for the preparation of porous Ge may not be a top-down process as has been widely considered, but a bottom up one. Systematic studies of the laser exposure on Ge nanoparticles prepared by colloidal synthesis results in the fact that the explosive crystallisation is common for H-terminated and partially disordered Ge nanoparticles regardless of its particle size. We suggest possible bio-medical applications for the observed phenomena.

  15. Laser-induced particle size tuning and structural transformations in germanium nanoparticles prepared by stain etching and colloidal synthesis route

    SciTech Connect

    Karatutlu, Ali E-mail: ali.karatutlu@bou.edu.tr; Seker, Isa

    2015-12-28

    In this study, with the aid of Raman measurements, we have observed transformations in small (∼3 nm and ∼10 nm) free-standing Ge nanoparticles under laser light exposure. The nanoparticles were obtained by the chemical stain etching of a monocrystalline Ge wafer and of Ge powder and by colloidal synthesis route. We found that the transformation path depends on laser power and exposure time. At relatively low values of the laser power (2 mW) over a period of 100 min, the Raman signal indicates transformation of the sample from a nanocrystaline to bulk-like state, followed by partial oxidation and finally a conversion of the entire sample into alpha-quartz type GeO{sub 2}. However, when the laser power is set at 60 mW, we observed a heat release during an explosive crystallization of the nanocrystalline material into bulk Ge without noticeable signs of oxidation. Together with the transmission electron microscopy measurements, these results suggest that the chemical stain etching method for the preparation of porous Ge may not be a top-down process as has been widely considered, but a bottom up one. Systematic studies of the laser exposure on Ge nanoparticles prepared by colloidal synthesis results in the fact that the explosive crystallisation is common for H-terminated and partially disordered Ge nanoparticles regardless of its particle size. We suggest possible bio-medical applications for the observed phenomena.

  16. Narrow linewidth two-electrode 1560 nm laterally coupled distributed feedback lasers with third-order surface etched gratings.

    PubMed

    Dridi, Kais; Benhsaien, Abdessamad; Zhang, Jessica; Hinzer, Karin; Hall, Trevor J

    2014-08-11

    We report on the design and characterization of a re-growth free InGaAsP/InP multiple quantum well two-electrode laterally coupled distributed feedback (LC-DFB) lasers. Third-order surface etched gratings have been defined on the ridge sidewalls along the laser cavity by means of stepper lithography. The lasers oscillate in single-mode around 1560 nm with high side mode suppression ratios (>52 dB), a wavelength tuning (≥ 3nm), an output power (≥ 6 mW), and narrow linewidth (<170 kHz) under various current injection ranges at room temperature. A minimum linewidth of 94 kHz has been recorded for 1500 µm-long two-electrode LC-DFB laser while providing non-uniform current injection through the two electrodes. The effect of the width of the inter-electrode gap on these different performance measures is also studied.

  17. Microleakage in Class V cavities with self-etching adhesive system and conventional rotatory or laser Er,Cr:YSGG

    PubMed Central

    Arnabat, J; España-Tost, T

    2012-01-01

    Objective: To analyse microleakage in Class V cavity preparation with Er;Cr:YSGG at different parameters using a self-etching adhesive system. Background: Several studies reported microleakage around composite restorations when cavity preparation is done or treated by Er;Cr:YSGG laser. We want to compare different energy densities in order to obtain the best parameters, when using a self-etching adhesive system. Methods: A class V preparations was performed in 120 samples of human teeth were divided in 3 groups: (1) Preparation using the burr. (2) Er;Cr:YSGG laser preparation with high energy 4W, 30 Hz, 50% Water 50% Air and (3) Er;Cr:YSGG laser preparation lower energy 1.5 W, 30 Hz, 30% Water 30% Air. All the samples were restored with self-etching adhesive system and hybrid composite. Thermocycling (5000 cycles) and immersed in 0.5% fuchsin. The restorations were sectioned and evaluated the microleakage with a stereomicroscope. Results: Lower energy laser used for preparation showed significant differences in enamel and dentin. To group 3, the microleakage in the enamel was less, whilst the group 1, treated with the turbine, showed less microleakage at dentin level. Group 2 showed the highest microleakage at dentin/cement level. Conclusion: Burr preparation gives the lowest microleakage at cement/dentin level, whilst Er;Cr:YSGG laser at lower power has the low energy obtains lowest microleakage at enamel. On the contrary high-energy settings produce inferior results in terms of microleakage. PMID:24511195

  18. Adhesion of a self-etching system to dental substrate prepared by Er:YAG laser or air abrasion.

    PubMed

    Souza-Zaroni, Wanessa C; Chinelatti, Michelle A; Delfino, Carina S; Pécora, Jesus D; Palma-Dibb, Regina G; Corona, Silmara A M

    2008-08-01

    The purpose of this study was to assess the microtensile bond strength of a self-etching adhesive system to enamel and dentin prepared by Er:YAG laser irradiation or air abrasion, as well as to evaluate the adhesive interfaces by scanning electron microscopy (SEM). For microtensile bond strength test, 80 third molars were randomly assigned to five groups: Group I, carbide bur, control (CB); II, air abrasion with standard tip (ST); III, air abrasion with supersonic tip (SP); IV, Er:YAG laser 250 mJ/4 Hz (L250); V, Er:YAG laser 300 mJ/4 Hz (L300). Each group was divided into two subgroups (n = 8) (enamel, E and dentin, D). E and D surfaces were treated with the self-etching system Adper Prompt L-Pop and composite buildups were done with Filtek Z-250. Sticks with a cross-sectional area of 0.8 mm(2) (+/-0.2 mm(2)) were obtained and the bond strength tests were performed. Data were submitted to ANOVA and Tukey's test. For morphological analysis, disks of 30 third molars were restored, sectioned and prepared for SEM. Dentin presented the highest values of adhesion, differing from enamel. Laser and air-abrasion preparations were similar to enamel. Dentin air-abrasion with standard tip group showed higher bond strength results than Er:YAG-laser groups, however, air-abrasion and Er:YAG laser groups were similar to control group. SEM micrographs revealed that, for both enamel and dentin, the air-abrasion and laser preparations presented irregular adhesive interfaces, different from the ones prepared by rotary instrument. It was concluded that cavity preparations accomplished by both Er:YAG laser energies and air abrasion tips did not positively influence the adhesion to enamel and dentin.

  19. Study of the effects of polishing, etching, cleaving, and water leaching on the UV laser damage of fused silica

    SciTech Connect

    Yoshiyama, J.; Genin, F.Y.; Salleo, A.; Thomas, I.; Kozlowski, M.R.; Sheehan, L.M.; Hutcheon, I.D.; Camp, D.W.

    1997-12-23

    A damage morphology study was performed with a 355 nm Nd:YAG laser on synthetic UV-grade fused silica to determine the effects of post- polish chemical etching on laser-induced damage, compare damage morphologies of cleaved and polished surfaces, and understand the effects of the hydrolyzed surface layer and waste-crack interactions. The samples were polished , then chemically etched in buffered HF solution to remove 45,90,135, and 180 nm of surface material. Another set of samples was cleaved and soaked in boiling distilled water for 1 second and 1 hour. All the samples were irradiated at damaging fluencies and characterized by Normarski optical microscopy and scanning electron microscopy. Damage was initiated as micro-pits on both input and output surfaces of the polished fused silica sample. At higher fluencies, the micro-pits generated cracks on the surface. Laser damage of the polished surface showed significant trace contamination levels within a 50 nm surface layer. Micro-pit formation also appeared after irradiating cleaved fused silica surfaces at damaging fluences. Linear damage tracks corresponding cleaving tracks were often observed on cleaved surfaces. Soaking cleaved samples in water produced wide laser damage tracks.

  20. In situ observation of atomic hydrogen etching on diamond-like carbon films produced by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Cheng, C.-L.; Chia, C.-T.; Chiu, C.-C.; Wu, C.-C.; Cheng, H.-F.; Lin, I.-N.

    2001-04-01

    Atomic hydrogen etching on the pulsed laser deposited (PLD) diamond-like carbon (DLC) films were examined in situ by using Raman spectroscopy. Thermal annealing of the as-prepared DLC films was found to alter the D-band (˜1355 cm -1) and G-band (˜1582 cm -1) from unresolved features at room temperature to clearly separated bands at above 500°C, indicating graphitization of the films. The presence of atomic hydrogen retards graphitization at temperatures lower than 500°C, presumably because reactive atomic hydrogen formed sp 3-bonding carbons which prevented graphitization at below 500°C, while at above 500°C, the hydrogen etches away disordered structure of the DLC film as the intensity changes of the D-bands demonstrate.

  1. Long-term dentin retention of etch-and-rinse and self-etch adhesives and a resin-modified glass ionomer cement in non-carious cervical lesions.

    PubMed

    van Dijken, Jan W V; Pallesen, Ulla

    2008-07-01

    The aim of this study was to evaluate the clinical long-term retention to dentin of seven adhesive systems. A total of 270 Class V restorations of four etch-and-rinse, one self-etch adhesive system and a resin-modified glass ionomer cement were placed in non-carious cervical lesions without intentional enamel involvement. The restorations were evaluated at baseline, 6, 12, 18, and 24 months and then every year during a 13-year follow-up. Dentin bonding efficiency was determined by the percentage of lost restorations. During the 13 years, 215 restorations could be evaluated. The cumulative loss rate at 13 years was 53.0%, with significant different failures rates for the different systems varying between 35.6 and 86.8%. Four systems fulfilled the ADA 18-month full acceptance retention criteria. Two systems showed at 18 months and earlier high debonding rates. The annual failure rates for the etch-and-rinse systems were Optibond 3.1%, Permagen 13.0%, Scotchbond MP 4.8%, Syntac classic 2.8%; for the self-etch system P&S 4.4%; and the resin-modified glass ionomer cement Vitremer 2.7%. It can be concluded that all systems showed a continuous degradation of the bond with a wide variation, which was independent of the adhesion strategy. Three bonding systems showed a cumulative failure rate after 13 years between 36 and 41% with the best retention for the resin-modified glass ionomer cement and a four-step etch-and-rinse system.

  2. AlGaN-Cladding-Free m-Plane InGaN/GaN Laser Diodes with p-Type AlGaN Etch Stop Layers

    NASA Astrophysics Data System (ADS)

    Farrell, Robert M.; Haeger, Daniel A.; Hsu, Po Shan; Hardy, Matthew T.; Kelchner, Kathryn M.; Fujito, Kenji; Feezell, Daniel F.; Mishra, Umesh K.; DenBaars, Steven P.; Speck, James S.; Nakamura, Shuji

    2011-09-01

    We present a new method of improving the accuracy and reproducibility of dry etching processes for ridge waveguide InGaN/GaN laser diodes (LDs). A GaN:Al0.09Ga0.91N etch rate selectivity of 11:1 was demonstrated for an m-plane LD with a 40 nm p-Al0.09Ga0.91N etch stop layer (ESL) surrounded by Al-free cladding layers, establishing the effectiveness of AlGaN-based ESLs for controlling etch depth in ridge waveguide InGaN/GaN LDs. These results demonstrate the potential for integrating AlGaN ESLs into commercial device designs where accurate control of the etch depth of the ridge waveguide is necessary for stable, kink-free operation at high output powers.

  3. Direct fabrication of compound-eye microlens array on curved surfaces by a facile femtosecond laser enhanced wet etching process

    NASA Astrophysics Data System (ADS)

    Bian, Hao; Wei, Yang; Yang, Qing; Chen, Feng; Zhang, Fan; Du, Guangqing; Yong, Jiale; Hou, Xun

    2016-11-01

    We report a direct fabrication of an omnidirectional negative microlens array on a curved substrate by a femtosecond laser enhanced chemical etching process, which is utilized as a molding template for duplicating bioinspired compound eyes. The femtosecond laser treatment of the curved glass substrate employs a common x-y-z stage without rotating the sample surface perpendicular to the laser beam, and uniform, omnidirectional-aligned negative microlenses are generated after a hydrofluoric acid etching. Using the negative microlens array on the concave glass substrate as a molding template, we fabricate an artificial compound eye with 3000 positive microlenses of 95-μm diameter close-packed on a 5-mm polymer hemisphere. Compared to the transferring process, the negative microlenses directly fabricated on the curved mold by our method are distortion-free, and the duplicated artificial eye presents clear and uniform imaging capabilities. This work provides a facile and efficient route to the fabrication of microlenses on any curved substrates without complicated alignment and motion control processes, which has the potential for the development of new microlens-based devices and systems.

  4. Laser-assisted focused He+ ion beam induced etching with and without XeF2 gas assist

    DOE PAGES

    Stanford, Michael G.; Mahady, Kyle; Lewis, Brett B.; ...

    2016-10-04

    Focused helium ion (He+) milling has been demonstrated as a high-resolution nanopatterning technique; however, it can be limited by its low sputter yield as well as the introduction of undesired subsurface damage. Here, we introduce pulsed laser- and gas-assisted processes to enhance the material removal rate and patterning fidelity. A pulsed laser-assisted He+ milling process is shown to enable high-resolution milling of titanium while reducing subsurface damage in situ. Gas-assisted focused ion beam induced etching (FIBIE) of Ti is also demonstrated in which the XeF2 precursor provides a chemical assist for enhanced material removal rate. In conclusion, a pulsed laser-assistedmore » and gas-assisted FIBIE process is shown to increase the etch yield by ~9× relative to the pure He+ sputtering process. These He+ induced nanopatterning techniques improve material removal rate, in comparison to standard He+ sputtering, while simultaneously decreasing subsurface damage, thus extending the applicability of the He+ probe as a nanopattering tool.« less

  5. Comparison of tensile bond strengths of four one-bottle self-etching adhesive systems with Er:YAG laser-irradiated dentin.

    PubMed

    Jiang, Qianzhou; Chen, Minle; Ding, Jiangfeng

    2013-12-01

    This study aimed to investigate the interaction of current one-bottle self-etching adhesives and Er:YAG laser with dentin using a tensile bond strength (TBS) test and scanning electron microscopy (SEM) in vitro. Two hundred and thirteen dentin discs were randomly distributed to the Control Group using bur cutting and to the Laser Group using an Er:YAG laser (200 mJ, VSP, 20 Hz). The following adhesives were investigated: one two-step total-etch adhesive [Prime & Bond NT (Dentsply)] and four one-step self-etch adhesives [G-Bond plus (GC), XENO V (Dentsply), iBond Self Etch (Heraeus) and Adper Easy One (3 M ESPE)]. Samples were restored with composite resin, and after 24-hour storage in distilled water, subjected to the TBS test. For morphological analysis, 12 dentin specimens were prepared for SEM. No significant differences were found between the control group and laser group (p = 0.899); dentin subjected to Prime & Bond NT, XENOV and Adper Easy One produced higher TBS. In conclusion, this study indicates that Er:YAG laser-prepared dentin can perform as well as bur on TBS, and some of the one-step one-bottle adhesives are comparable to the total-etch adhesives in TBS on dentin.

  6. Characterization and adsorption properties of diatomaceous earth modified by hydrofluoric acid etching.

    PubMed

    Tsai, Wen-Tien; Lai, Chi-Wei; Hsien, Kuo-Jong

    2006-05-15

    This work was a study of the chemical modification of diatomaceous earth (DE) using hydrofluoric acid (HF) solution. Under the experimental conditions investigated, it was found that HF under controlled conditions significantly etched inward into the interior of the existing pore structure in the clay mineral due to its high content of silica, leaving a framework possessing a larger BET surface area (ca. 10 m2 g(-1)) in comparison with that (ca. 4 m2 g(-1)) of its precursor (i.e., DE). Further, the results indicated that the HF concentration is a more determining factor in creating more open pores than other process parameters (temperature, holding time, and solid/liquid ratio). This observation was also in close agreement with the examinations by the silicon analysis, scanning electron microscopy, X-ray diffraction, and Fourier transform infrared spectroscopy. The adsorption kinetics and the adsorption isotherm of methylene blue onto the resulting clay adsorbent can be well described by a pseudo-second-order reaction model and the Freundlich model, respectively.

  7. Quantum cascade laser based monitoring of CF{sub 2} radical concentration as a diagnostic tool of dielectric etching plasma processes

    SciTech Connect

    Hübner, M.; Lang, N.; Röpcke, J.; Helden, J. H. van; Zimmermann, S.; Schulz, S. E.; Buchholtz, W.

    2015-01-19

    Dielectric etching plasma processes for modern interlevel dielectrics become more and more complex by the introduction of new ultra low-k dielectrics. One challenge is the minimization of sidewall damage, while etching ultra low-k porous SiCOH by fluorocarbon plasmas. The optimization of this process requires a deeper understanding of the concentration of the CF{sub 2} radical, which acts as precursor in the polymerization of the etch sample surfaces. In an industrial dielectric etching plasma reactor, the CF{sub 2} radical was measured in situ using a continuous wave quantum cascade laser (cw-QCL) around 1106.2 cm{sup −1}. We measured Doppler-resolved ro-vibrational absorption lines and determined absolute densities using transitions in the ν{sub 3} fundamental band of CF{sub 2} with the aid of an improved simulation of the line strengths. We found that the CF{sub 2} radical concentration during the etching plasma process directly correlates to the layer structure of the etched wafer. Hence, this correlation can serve as a diagnostic tool of dielectric etching plasma processes. Applying QCL based absorption spectroscopy opens up the way for advanced process monitoring and etching controlling in semiconductor manufacturing.

  8. An In Vitro Comparison of the Bond Strength of Composite to Superficial and Deep Dentin, Treated With Er:YAG Laser Irradiation or Acid-Etching

    PubMed Central

    Alaghehmand, Homayoon; Nezhad Nasrollah, Fatemeh; Nokhbatolfoghahaei, Hanieh; Fekrazad, Reza

    2016-01-01

    Introduction: The aim of this study was to compare the micro-shear bond strength of composite resin on superficial and deep dentin after conditioning with phosphoric acid and Erbium-Doped Yttrium Aluminum Garnet (Er:YAG) laser. Methods: Thirty human molars were selected, roots were removed and crowns were bisected to provide a total of 60 half-crowns. Specimens were ground to expose superficial and deep dentin. Samples were assigned to six groups: (1) AS (acid etching of superficial dentin); (2) AD (acid etching of deep dentin); (3) LS (Er:YAG laser irradiation on superficial dentin); (4) LD (Er:YAG laser irradiation on deep dentin); (5) LAS (Er:YAG laser irradiation on superficial dentin followed by acid etching); (6) LAD (Er:YAG laser irradiation on deep dentin followed by acid etching) The adhesive protocol was performed. Samples were thermocycled and micro-shear bond strength was tested to failure. The data were submitted to statistical analysis with one-way analysis of variance (ANOVA) and Tukey post hoc test. Results: The AS group, demonstrated the greatest amount of micro-shear bond strength. Statistical analysis showed a decrease in bond strength in laser-treated groups which was more significant for deep dentin. Conclusion: Preparation of dentin with laser did not improve bonding to superficial and deep dentin. PMID:28144437

  9. An In Vitro Comparison of the Bond Strength of Composite to Superficial and Deep Dentin, Treated With Er:YAG Laser Irradiation or Acid-Etching.

    PubMed

    Alaghehmand, Homayoon; Nezhad Nasrollah, Fatemeh; Nokhbatolfoghahaei, Hanieh; Fekrazad, Reza

    2016-01-01

    Introduction: The aim of this study was to compare the micro-shear bond strength of composite resin on superficial and deep dentin after conditioning with phosphoric acid and Erbium-Doped Yttrium Aluminum Garnet (Er:YAG) laser. Methods: Thirty human molars were selected, roots were removed and crowns were bisected to provide a total of 60 half-crowns. Specimens were ground to expose superficial and deep dentin. Samples were assigned to six groups: (1) AS (acid etching of superficial dentin); (2) AD (acid etching of deep dentin); (3) LS (Er:YAG laser irradiation on superficial dentin); (4) LD (Er:YAG laser irradiation on deep dentin); (5) LAS (Er:YAG laser irradiation on superficial dentin followed by acid etching); (6) LAD (Er:YAG laser irradiation on deep dentin followed by acid etching) The adhesive protocol was performed. Samples were thermocycled and micro-shear bond strength was tested to failure. The data were submitted to statistical analysis with one-way analysis of variance (ANOVA) and Tukey post hoc test. Results: The AS group, demonstrated the greatest amount of micro-shear bond strength. Statistical analysis showed a decrease in bond strength in laser-treated groups which was more significant for deep dentin. Conclusion: Preparation of dentin with laser did not improve bonding to superficial and deep dentin.

  10. Nonpolar III-nitride vertical-cavity surface-emitting laser with a photoelectrochemically etched air-gap aperture

    SciTech Connect

    Leonard, J. T. Yonkee, B. P.; Cohen, D. A.; Megalini, L.; Speck, J. S.; Lee, S.; DenBaars, S. P.; Nakamura, S.

    2016-01-18

    We demonstrate a III-nitride nonpolar vertical-cavity surface-emitting laser (VCSEL) with a photoelectrochemically (PEC) etched aperture. The PEC lateral undercut etch is used to selectively remove the multi-quantum well (MQW) region outside the aperture area, defined by an opaque metal mask. This PEC aperture (PECA) creates an air-gap in the passive area of the device, allowing one to achieve efficient electrical confinement within the aperture, while simultaneously achieving a large index contrast between core of the device (the MQW within the aperture) and the lateral cladding of the device (the air-gap formed by the PEC etch), leading to strong lateral confinement. Scanning electron microscopy and focused ion-beam analysis is used to investigate the precision of the PEC etch technique in defining the aperture. The fabricated single mode PECA VCSEL shows a threshold current density of ∼22 kA/cm{sup 2} (25 mA), with a peak output power of ∼180 μW, at an emission wavelength of 417 nm. The near-field emission profile shows a clearly defined single linearly polarized (LP) mode profile (LP{sub 12,1}), which is in contrast to the filamentary lasing that is often observed in III-nitride VCSELs. 2D mode profile simulations, carried out using COMSOL, give insight into the different mode profiles that one would expect to be displayed in such a device. The experimentally observed single mode operation is proposed to be predominantly a result of poor current spreading in the device. This non-uniform current spreading results in a higher injected current at the periphery of the aperture, which favors LP modes with high intensities near the edge of the aperture.

  11. Nonpolar III-nitride vertical-cavity surface-emitting laser with a photoelectrochemically etched air-gap aperture

    NASA Astrophysics Data System (ADS)

    Leonard, J. T.; Yonkee, B. P.; Cohen, D. A.; Megalini, L.; Lee, S.; Speck, J. S.; DenBaars, S. P.; Nakamura, S.

    2016-01-01

    We demonstrate a III-nitride nonpolar vertical-cavity surface-emitting laser (VCSEL) with a photoelectrochemically (PEC) etched aperture. The PEC lateral undercut etch is used to selectively remove the multi-quantum well (MQW) region outside the aperture area, defined by an opaque metal mask. This PEC aperture (PECA) creates an air-gap in the passive area of the device, allowing one to achieve efficient electrical confinement within the aperture, while simultaneously achieving a large index contrast between core of the device (the MQW within the aperture) and the lateral cladding of the device (the air-gap formed by the PEC etch), leading to strong lateral confinement. Scanning electron microscopy and focused ion-beam analysis is used to investigate the precision of the PEC etch technique in defining the aperture. The fabricated single mode PECA VCSEL shows a threshold current density of ˜22 kA/cm2 (25 mA), with a peak output power of ˜180 μW, at an emission wavelength of 417 nm. The near-field emission profile shows a clearly defined single linearly polarized (LP) mode profile (LP12,1), which is in contrast to the filamentary lasing that is often observed in III-nitride VCSELs. 2D mode profile simulations, carried out using COMSOL, give insight into the different mode profiles that one would expect to be displayed in such a device. The experimentally observed single mode operation is proposed to be predominantly a result of poor current spreading in the device. This non-uniform current spreading results in a higher injected current at the periphery of the aperture, which favors LP modes with high intensities near the edge of the aperture.

  12. TiO2 nanowire arrays modified with a simultaneous "etching, doping and deposition" technique for ultrasensitive amperometric immunosensing.

    PubMed

    Liu, Xiaoqiang; Huo, Xiaohe; Liu, Peipei; Tang, Yunfei; Xu, Jun; Ju, Huangxian

    2017-06-15

    In this work, an ultrasensitive immunosensing scaffold was structured with TiO2 nanowire (TiNW) arrays modified with molybdenum (Mo) and MoS2 flakes by a triplex "etching, doping and deposition" technique. The triply modification of TiNW arrays improved their electron transfer, and the decoration of MoS2 flakes on TiNW arrays increased both the conductivity and the specific surface area of TiNW. Accordingly, the triply modified TiNW arrays provided a biocompatible microenviroment for the biomolecules and high specific surface area to load big amount of biomolecules. The immunosensor was prepared by immobilizing capture antibody on the scaffold surface with double amino-reactive crosslinker, and the tracing labels were prepared by immobilizing signal antibody and horseradish peroxidase molecules on cylinder-shaped TiO2 nanorods. After sandwich-type immunoreaction, the tracing labels were quantitatively captured on the immunosensor surface for the detection of carcinoembryonic antigen as a model analyte. This amperometric method showed a linear range of 0.001 and 150ngmL(-1) with a detection limit of 0.5pgmL(-1). This work provided a promising platform for sensitive amperometric immunosensing of protein biomarkers.

  13. Micromorphology of resin-dentin interfaces using one-bottle etch&rinse and self-etching adhesive systems on laser-treated dentin surfaces: a confocal laser scanning microscope analysis.

    PubMed

    de Oliveira, Marcelo Tavares; Arrais, Cesar Augusto Galvão; Aranha, Ana Cecília; de Paula Eduardo, Carlos; Miyake, Katsuya; Rueggeberg, Frederick Allen; Giannini, Marcelo

    2010-09-01

    This study evaluated the hybrid layer (HL) morphology created by three adhesive systems (AS) on dentin surfaces treated with Er:YAG laser using two irradiation parameters. Occlusal flat dentin surfaces of 36 human third molars were assigned into nine groups (n = 4) according to the following ASs: one bottle etch&rinse Single Bond Plus (3M ESPE), two-step Clearfil Protect Bond (Kuraray), and all-in-one S(3) Bond (Kuraray) self-etching, which were labeled with rhodamine B or fluorescein isothiocyanate-dextran and were applied to dentin surfaces that were irradiated with Er:YAG laser at either 120 (38.7 J/cm(2)) or 200 mJ/pulse (64.5 J/cm(2)), or were applied to untreated dentin surfaces (control group). The ASs were light-activated following MI and the bonded surfaces were restored with resin composite Z250 (3M ESPE). After 24 hours of storage in vegetable oil, the restored teeth were vertically, serially sectioned into 1-mm thick slabs, which had the adhesive interfaces analyzed with confocal laser microscope (CLSM-LSM 510 Meta). CLSM images were recorded in the fluorescent mode from three different regions along each bonded interface. Non-uniform HL was created on laser-irradiated dentin surfaces regardless of laser irradiation protocol for all AS, while regular and uniform HL was observed in the control groups. "Stretch mark"-like red lines were found within the HL as a result of resin infiltration into dentin microfissures, which were predominantly observed in 200 mJ/pulse groups regardless of AS. Poor resin infiltration into peritubular dentin was observed in most regions of adhesive interfaces created by all ASs on laser-irradiated dentin, resulting in thin resin tags with neither funnel-shaped morphology nor lateral resin projections. Laser irradiation of dentin surfaces at 120 or 200 mJ/pulse resulted in morphological changes in HL and resin tags for all ASs evaluated in the study. 2010 Wiley-Liss, Inc.

  14. Evaluation of Self-Etching Adhesive and Er:YAG Laser Conditioning on the Shear Bond Strength of Orthodontic Brackets

    PubMed Central

    Contreras-Bulnes, Rosalía; Scougall-Vilchis, Rogelio J.; Rodríguez-Vilchis, Laura E.; Centeno-Pedraza, Claudia; Olea-Mejía, Oscar F.; Alcántara-Galena, María del Carmen Z.

    2013-01-01

    The purpose of this study was to evaluate the shear bond strength, the adhesive remnant index scores, and etch surface of teeth prepared for orthodontic bracket bonding with self-etching primer and Er:YAG laser conditioning. One hundred and twenty bovine incisors were randomly divided into four groups. In Group I (Control), the teeth were conditioned with 35% phosphoric acid for 15 seconds. In Group II the teeth were conditioned with Transbond Plus SEP (5 sec); III and IV were irradiated with the Er:YAG 150 mJ (11.0 J/cm2), 150 mJ (19.1 J/cm2), respectively, at 7–12 Hz with water spray. After surface preparation, upper central incisor stainless steel brackets were bonded with Transbond Plus Color Change Adhesive. The teeth were stored in water at 37°C for 24 hours and shear bond strengths were measured, and adhesive remnant index (ARI) was determined. The conditioned surface was observed under a scanning electron microscope. One-way ANOVA and chi-square test were used. Group I showed the significantly highest values of bond strength with a mean value of 8.2 megapascals (MPa). The lesser amount of adhesive remnant was found in Group III. The results of this study suggest that Er:YAG laser irradiation could not be an option for enamel conditioning. PMID:24228014

  15. Evaluation of self-etching adhesive and Er:YAG laser conditioning on the shear bond strength of orthodontic brackets.

    PubMed

    Contreras-Bulnes, Rosalía; Scougall-Vilchis, Rogelio J; Rodríguez-Vilchis, Laura E; Centeno-Pedraza, Claudia; Olea-Mejía, Oscar F; Alcántara-Galena, María del Carmen Z

    2013-01-01

    The purpose of this study was to evaluate the shear bond strength, the adhesive remnant index scores, and etch surface of teeth prepared for orthodontic bracket bonding with self-etching primer and Er:YAG laser conditioning. One hundred and twenty bovine incisors were randomly divided into four groups. In Group I (Control), the teeth were conditioned with 35% phosphoric acid for 15 seconds. In Group II the teeth were conditioned with Transbond Plus SEP (5 sec); III and IV were irradiated with the Er:YAG 150 mJ (11.0 J/cm²), 150 mJ (19.1 J/cm²), respectively, at 7-12 Hz with water spray. After surface preparation, upper central incisor stainless steel brackets were bonded with Transbond Plus Color Change Adhesive. The teeth were stored in water at 37°C for 24 hours and shear bond strengths were measured, and adhesive remnant index (ARI) was determined. The conditioned surface was observed under a scanning electron microscope. One-way ANOVA and chi-square test were used. Group I showed the significantly highest values of bond strength with a mean value of 8.2 megapascals (MPa). The lesser amount of adhesive remnant was found in Group III. The results of this study suggest that Er:YAG laser irradiation could not be an option for enamel conditioning.

  16. Atomic diffusion in laser surface modified AISI H13 steel

    NASA Astrophysics Data System (ADS)

    Aqida, S. N.; Brabazon, D.; Naher, S.

    2013-07-01

    This paper presents a laser surface modification process of AISI H13 steel using 0.09 and 0.4 mm of laser spot sizes with an aim to increase surface hardness and investigate elements diffusion in laser modified surface. A Rofin DC-015 diffusion-cooled CO2 slab laser was used to process AISI H13 steel samples. Samples of 10 mm diameter were sectioned to 100 mm length in order to process a predefined circumferential area. The parameters selected for examination were laser peak power, pulse repetition frequency (PRF), and overlap percentage. The hardness properties were tested at 981 mN force. Metallographic study and energy dispersive X-ray spectroscopy (EDXS) were performed to observe presence of elements and their distribution in the sample surface. Maximum hardness achieved in the modified surface was 1017 HV0.1. Change of elements composition in the modified layer region was detected in the laser modified samples. Diffusion possibly occurred for C, Cr, Cu, Ni, and S elements. The potential found for increase in surface hardness represents an important method to sustain tooling life. The EDXS findings signify understanding of processing parameters effect on the modified surface composition.

  17. Long-wavelength vertical-cavity surface-emitting lasers with selectively etched thin apertures

    NASA Astrophysics Data System (ADS)

    Feezell, Daniel F.

    Long-wavelength vertical-cavity surface-emitting lasers (VCSELs) emitting in the 1300--1600nm wavelength window are attractive light sources for short to mid-range optical fiber communications. These devices target low-loss and low-dispersion minima in standard optical fibers and are expected to provide a low-cost alternative to the existing edge-emitting infrastructure. With low-power consumption, on wafer testing; simple packaging, and high fiber-coupling efficiency, VCSELs are ideal transmitters for CWDM, metro, local area, and storage area networks. Recently, much attention has been devoted to a rich variety of approaches to long-wavelength VCSELs. One underlying problem, however, has been the need to match a reliable high-gain active region with high-index-contrast distributed Bragg reflectors (DBRs) over the full 1300--1600nm wavelength range. One solution to this problem is to utilize well-established InAlGaAs active-region technology coupled with AlGaAsSb DBRs. This combination facilitates monolithic all-epitaxial InP-based devices spanning the entire 1300--1600nm wavelength range. Previously, Dr. Shigeru Nakagawa and Dr. Eric Hall have demonstrated long-wavelength VCSELs with Sb-based technology operating at 1550nm. This dissertation demonstrates the first high-performance InP-based VCSELs with Sb-based DBRs operating at 1310nm, thus solidifying Sb-based technology as a wavelength flexible platform for long-wavelength devices. Also developed is a novel and efficient tunnel-junction aperturing technology for generating extremely low-loss optical and electrical confinement. Lastly, it is shown that the benefits from such an aperturing scheme produce marked improvements in device operation versus previously demonstrated Sb-based VCSELs. The devices from this research generated over 1.6mW single-mode continuous-wave (CW) output power at room temperature (>2mW multi-mode), displayed threshold currents down to 1mA, and operated CW up to 90°C. Furthermore, world

  18. Use of Laser-Etched Pouches to Control the Volume Expansion of Kimchi Packages During Distribution: Impact of Packaging and Storage on Quality Characteristics.

    PubMed

    Lee, Hyun-Gyu; Yoo, SeungRan

    2017-08-01

    Use of laser-etched pouches was investigated to develop kimchi packages with gas control functions. According to the degree of laser processing, the headspace pressure, atmospheric composition, and water vapor transmission rate of the kimchi packages were measured to investigate the potential use of laser-etched packages for kimchi. In addition, the pH, titratable acidity, organic acid, and microbial population of the packaged kimchi were examined to study the effect of packaging and storage conditions on its quality characteristics. The concentration of carbon dioxide in the pouches with a high gas transmission rate was less than that in other pouches (P < 0.05), indicating that low a carbon dioxide concentration resulted in less volume expansion. During the storage period (P < 0.05), the gas pressure in some pouches started to increase after the 15th d at 10 °C. Few differences were observed between the quality characteristics of kimchi (for example, pH, titratable acidity, organic acid, and microbial count). In addition, this study indicated that the higher the storage temperature, the more rapid the fermentation. Consequently, laser-etched pouches demonstrate the potential for controlling the gas, which in turn maintains the quality of kimchi. The use of laser-etched films could exert marked effects on alleviating the volume expansion or pressure build-up in kimchi packages. © 2017 Institute of Food Technologists®.

  19. Comparison of Shear Bond Strength of Orthodontic Brackets Bonded to Enamel Prepared By Er:YAG Laser and Conventional Acid-Etching

    PubMed Central

    Hosseini, M.H.; Namvar, F.; Chalipa, J.; Saber, K.; Chiniforush, N.; Sarmadi, S.; Mirhashemi, A.H.

    2012-01-01

    Introduction: The purpose of this study was to compare shear bond strength (SBS) of orthodontic brackets bonded to enamel prepared by Er:YAG laser with two different powers and conventional acid-etching. Materials and Methods: Forty-five human premolars extracted for orthodontic purposes were randomly assigned to three groups based on conditioning method: Group 1- conventional etching with 37% phosphoric acid; Group 2- irradiation with Er:YAG laser at 1 W; and Group 3- irradiation with Er:YAG laser at 1.5 W. Metal brackets were bonded on prepared enamel using a light-cured composite. All groups were subjected to thermocycling process. Then, the specimens mounted in auto-cure acryle and shear bond strength were measured using a universal testing machine with a crosshead speed of 0.5 mm per second. After debonding, the amount of resin remaining on the teeth was determined using the adhesive remnant index (ARI) scored 1 to 5. One-way analysis of variance was used to compare shear bond strengths and the Kruskal-Wallis test was performed to evaluate differences in the ARI for different etching types. Results: The mean and standard deviation of conventional acid-etch group, 1W laser group and 1.5W laser group was 3.82 ± 1.16, 6.97 ± 3.64 and 6.93 ± 4.87, respectively. Conclusion: The mean SBS obtained with an Er:YAG laser operated at 1W or 1.5W is approximately similar to that of conventional etching. However, the high variability of values in bond strength of irradiated enamel should be considered to find the appropriate parameters for applying Er:YAG laser as a favorable alternative for surface conditioning. PMID:22924098

  20. Bond strength of etch-and-rinse and self-etch adhesive systems to enamel and dentin irradiated with a novel CO2 9.3 μm short-pulsed laser for dental restorative procedures.

    PubMed

    Rechmann, Peter; Bartolome, N; Kinsel, R; Vaderhobli, R; Rechmann, B M T

    2017-08-15

    The objective of this study was to evaluate the influence of CO2 9.3 μm short-pulsed laser irradiation on the shear bond strength of composite resin to enamel and dentin. Two hundred enamel and 210 dentin samples were irradiated with a 9.3 µm carbon dioxide laser (Solea, Convergent Dental, Inc., Natick, MA) with energies which either enhanced caries resistance or were effective for ablation. OptiBond Solo Plus [OptiBondTE] (Kerr Corporation, Orange, CA) and Peak Universal Bond light-cured adhesive [PeakTE] (Ultradent Products, South Jordan, UT) were used. In addition, Scotchbond Universal [ScotchbondSE] (3M ESPE, St. Paul, MN) and Peak SE self-etching primer with Peak Universal Bond light-cured adhesive [PeakSE] (Ultradent Products) were tested. Clearfil APX (Kuraray, New York, NY) was bonded to the samples. After 24 h, a single plane shear bond test was performed. Using the caries preventive setting on enamel resulted in increased shear bond strength for all bonding agents except for self-etch PeakSE. The highest overall bond strength was seen with PeakTE (41.29 ± 6.04 MPa). Etch-and-rinse systems achieved higher bond strength values to ablated enamel than the self-etch systems did. PeakTE showed the highest shear bond strength with 35.22 ± 4.40 MPa. OptiBondTE reached 93.8% of its control value. The self-etch system PeakSE presented significantly lower bond strength. The shear bond strength to dentin ranged between 19.15 ± 3.49 MPa for OptiBondTE and 43.94 ± 6.47 MPa for PeakSE. Etch-and-rinse systems had consistently higher bond strength to CO2 9.3 µm laser-ablated enamel. Using the maximum recommended energy for dentin ablation, the self-etch system PeakSE reached the highest bond strength (43.9 ± 6.5 MPa).

  1. Fabrication of silicon nanowire arrays by near-field laser ablation and metal-assisted chemical etching

    NASA Astrophysics Data System (ADS)

    Brodoceanu, D.; Alhmoud, H. Z.; Elnathan, R.; Delalat, B.; Voelcker, N. H.; Kraus, T.

    2016-02-01

    We present an elegant route for the fabrication of ordered arrays of vertically-aligned silicon nanowires with tunable geometry at controlled locations on a silicon wafer. A monolayer of transparent microspheres convectively assembled onto a gold-coated silicon wafer acts as a microlens array. Irradiation with a single nanosecond laser pulse removes the gold beneath each focusing microsphere, leaving behind a hexagonal pattern of holes in the gold layer. Owing to the near-field effects, the diameter of the holes can be at least five times smaller than the laser wavelength. The patterned gold layer is used as catalyst in a metal-assisted chemical etching to produce an array of vertically-aligned silicon nanowires. This approach combines the advantages of direct laser writing with the benefits of parallel laser processing, yielding nanowire arrays with controlled geometry at predefined locations on the silicon surface. The fabricated VA-SiNW arrays can effectively transfect human cells with a plasmid encoding for green fluorescent protein.

  2. The Effect of Carbon Dioxide (CO2) Laser on Sandblasting with Large Grit and Acid Etching (SLA) Surface.

    PubMed

    Foroutan, Tahereh; Ayoubian, Nader

    2013-01-01

    The purpose of this study was to investigate the effect of 6W power Carbon Dioxide Laser (CO2) on the biologic compatibility of the Sandblasting with large grit and acid etching (SLA) titanium discs through studying of the Sarcoma Osteogenic (SaOS-2) human osteoblast-like cells viability. Sterilized titanium discs were used together with SaOS-2 human osteoblast-like cells. 6 sterilized SLA titanium discs of the experimental group were exposed to irradiation by CO2 laser with a power of 6W and 10.600nm wavelength, at fixed frequency of 80Hz during 45 seconds in both pulse and non-contact settings. SaOS-2 human osteoblast-like cells were incubated under 37°C in humid atmosphere (95% weather, 5% CO2) for 72 hours. MTT test was performed to measure the ratio level of cellular proliferation. The results indicated that at 570nm wavelength, the 6W CO2 laser power have not affected the cellular viability. CO2 laser in 6w power has had no effect on the biologic compatibility of the SLA titanium surface.

  3. Effects of Er:YAG laser on bond strength of self-etching adhesives to caries-affected dentin.

    PubMed

    Koyuturk, Alp Erdin; Ozmen, Bilal; Cortcu, Murat; Tokay, Ugur; Tosun, Gul; Erhan Sari, Mustafa

    2014-04-01

    The erbium:yttrium-aluminum-garnet (Er:YAG) laser may be effective the bond strength of adhesive systems on dentine surfaces, the chemical composition and aggressiveness of adhesive systems in clinical practice. The purpose of this study was to evaluate the effects of the Er:YAG laser system with the bonding ability of two different self-etching adhesives to caries-affected dentine in primary molars. Ninety mid-coronal flat dentine surfaces obtained from sound and caries-affected human primary dentine were treated with an Er:YAG laser or a bur. The prepared surfaces were restored with an adhesive system (Xeno V; Clearfil S³) and a compomer (Dyract Extra). The restored teeth were sectioned with a low-speed saw and 162 samples were obtained. The bond strength of the adhesive systems was tested using the micro-tensile test method. The data were statistically analyzed. A restored tooth in each group was processed for scanning electron microscopy evaluation. The values of the highest bond strength were obtained from the Clearfil S³-Er:YAG laser-sound dentine group in all groups. (24.57 ± 7.27 MPa) (P > 0.05). The values of the lowest bond strength were obtained from the Xeno V-Er:YAG laser-sound dentine group in all groups (11.01 ± 3.89 MPa). It was determined that the Clearfil S³ increased the bond strength on the surface applied with Er:YAG laser according to the Xeno V. Copyright © 2014 Wiley Periodicals, Inc.

  4. Periodic nanostructuring of Er/Yb-codoped IOG1 phosphate glass by using ultraviolet laser-assisted selective chemical etching

    SciTech Connect

    Pappas, C.; Pissadakis, S.

    2006-12-01

    The patterning of submicron period ({approx_equal}500 nm) Bragg reflectors in the Er/Yb-codoped IOG1 Schott, phosphate glass is demonstrated. A high yield patterning technique is presented, wherein high volume damage is induced into the glass matrix by exposure to intense ultraviolet 213 nm, 150 ps Nd:YAG laser radiation and, subsequently, a chemical development in potassium hydroxide (KOH)/ethylenediamine tetra-acetic acid (EDTA) aqueous solution selectively etches the exposed areas. The electronic changes induced by the 213 nm ultraviolet irradiation are examined by employing spectrophotometric measurements, while an estimation of the refractive index changes recorded is provided by applying Kramers-Kronig transformation to the absorption change data. In addition, real time diffraction efficiency measurements were obtained during the formation of the volume damage grating. After the exposure, the growth of the relief grating pattern in time was measured at fixed time intervals and the dependence of the grating depth on the etching time and exposure conditions is presented. The gratings fabricated are examined by atomic and scanning electron microscopies to reveal the relief topology of the structures. Gratings with average depth of 120 nm and excellent surface quality were fabricated by exposing the IOG1 phosphate glass to 36 000 pulses of 208 mJ/cm{sup 2} energy density, followed by developing in the KOH/EDTA agent for 6 min.

  5. Laser-Modified Surface Enhances Osseointegration and Biomechanical Anchorage of Commercially Pure Titanium Implants for Bone-Anchored Hearing Systems

    PubMed Central

    Omar, Omar; Simonsson, Hanna; Palmquist, Anders; Thomsen, Peter

    2016-01-01

    Osseointegrated implants inserted in the temporal bone are a vital component of bone-anchored hearing systems (BAHS). Despite low implant failure levels, early loading protocols and simplified procedures necessitate the application of implants which promote bone formation, bone bonding and biomechanical stability. Here, screw-shaped, commercially pure titanium implants were selectively laser ablated within the thread valley using an Nd:YAG laser to produce a microtopography with a superimposed nanotexture and a thickened surface oxide layer. State-of-the-art machined implants served as controls. After eight weeks’ implantation in rabbit tibiae, resonance frequency analysis (RFA) values increased from insertion to retrieval for both implant types, while removal torque (RTQ) measurements showed 153% higher biomechanical anchorage of the laser-modified implants. Comparably high bone area (BA) and bone-implant contact (BIC) were recorded for both implant types but with distinctly different failure patterns following biomechanical testing. Fracture lines appeared within the bone ~30–50 μm from the laser-modified surface, while separation occurred at the bone-implant interface for the machined surface. Strong correlations were found between RTQ and BIC and between RFA at retrieval and BA. In the endosteal threads, where all the bone had formed de novo, the extracellular matrix composition, the mineralised bone area and osteocyte densities were comparable for the two types of implant. Using resin cast etching, osteocyte canaliculi were observed directly approaching the laser-modified implant surface. Transmission electron microscopy showed canaliculi in close proximity to the laser-modified surface, in addition to a highly ordered arrangement of collagen fibrils aligned parallel to the implant surface contour. It is concluded that the physico-chemical surface properties of laser-modified surfaces (thicker oxide, micro- and nanoscale texture) promote bone bonding

  6. Laser-Modified Surface Enhances Osseointegration and Biomechanical Anchorage of Commercially Pure Titanium Implants for Bone-Anchored Hearing Systems.

    PubMed

    Shah, Furqan A; Johansson, Martin L; Omar, Omar; Simonsson, Hanna; Palmquist, Anders; Thomsen, Peter

    2016-01-01

    Osseointegrated implants inserted in the temporal bone are a vital component of bone-anchored hearing systems (BAHS). Despite low implant failure levels, early loading protocols and simplified procedures necessitate the application of implants which promote bone formation, bone bonding and biomechanical stability. Here, screw-shaped, commercially pure titanium implants were selectively laser ablated within the thread valley using an Nd:YAG laser to produce a microtopography with a superimposed nanotexture and a thickened surface oxide layer. State-of-the-art machined implants served as controls. After eight weeks' implantation in rabbit tibiae, resonance frequency analysis (RFA) values increased from insertion to retrieval for both implant types, while removal torque (RTQ) measurements showed 153% higher biomechanical anchorage of the laser-modified implants. Comparably high bone area (BA) and bone-implant contact (BIC) were recorded for both implant types but with distinctly different failure patterns following biomechanical testing. Fracture lines appeared within the bone ~30-50 μm from the laser-modified surface, while separation occurred at the bone-implant interface for the machined surface. Strong correlations were found between RTQ and BIC and between RFA at retrieval and BA. In the endosteal threads, where all the bone had formed de novo, the extracellular matrix composition, the mineralised bone area and osteocyte densities were comparable for the two types of implant. Using resin cast etching, osteocyte canaliculi were observed directly approaching the laser-modified implant surface. Transmission electron microscopy showed canaliculi in close proximity to the laser-modified surface, in addition to a highly ordered arrangement of collagen fibrils aligned parallel to the implant surface contour. It is concluded that the physico-chemical surface properties of laser-modified surfaces (thicker oxide, micro- and nanoscale texture) promote bone bonding which

  7. A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064 nm

    NASA Astrophysics Data System (ADS)

    Schwaller, P.; Zehnder, S.; von Arx, U.; Neuenschwander, B.

    Laser induced back side wet etching has shown to be a promising tool for the micro-structuring of transparent materials. Detailed studies have been performed using UV excimer laser sources, aromatic hydrocarbon and liquid metal absorbers. Only little work is reported however using aqueous Cu solutions as absorbers and ns laser pulses at 1064 nm wavelength. We present a novel model for this specific setup. Our experiments indicate that physisorbed Cu2+ ions at the polar glass surface absorb the laser light. This leads to local thermal stresses in the glass and subsequent micro-ablation.

  8. Etching and Growth of GaAs

    NASA Technical Reports Server (NTRS)

    Seabaugh, A. C.; Mattauch, R., J.

    1983-01-01

    In-place process for etching and growth of gallium arsenide calls for presaturation of etch and growth melts by arsenic source crystal. Procedure allows precise control of thickness of etch and newly grown layer on substrate. Etching and deposition setup is expected to simplify processing and improve characteristics of gallium arsenide lasers, high-frequency amplifiers, and advanced integrated circuits.

  9. Etching and Growth of GaAs

    NASA Technical Reports Server (NTRS)

    Seabaugh, A. C.; Mattauch, R., J.

    1983-01-01

    In-place process for etching and growth of gallium arsenide calls for presaturation of etch and growth melts by arsenic source crystal. Procedure allows precise control of thickness of etch and newly grown layer on substrate. Etching and deposition setup is expected to simplify processing and improve characteristics of gallium arsenide lasers, high-frequency amplifiers, and advanced integrated circuits.

  10. Modified Phasemeter for a Heterodyne Laser Interferometer

    NASA Technical Reports Server (NTRS)

    Loya, Frank M.

    2010-01-01

    Modifications have been made in the design of instruments of the type described in "Digital Averaging Phasemeter for Heterodyne Interferometry". A phasemeter of this type measures the difference between the phases of the unknown and reference heterodyne signals in a heterodyne laser interferometer. The phasemeter design lacked immunity to drift of the heterodyne frequency, was bandwidth-limited by computer bus architectures then in use, and was resolution-limited by the nature of field-programmable gate arrays (FPGAs) then available. The modifications have overcome these limitations and have afforded additional improvements in accuracy, speed, and modularity. The modifications are summarized.

  11. Three dimensional material removal model of laser-induced backside wet etching of sapphire substrate with CuSO4 solutions

    NASA Astrophysics Data System (ADS)

    Xie, Xiaozhu; Huang, Xiandong; Jiang, Wei; Wei, Xin; Hu, Wei; Ren, Qinglei

    2017-03-01

    The mechanism of laser-induced backside wet etching (LIBWE) of sapphire substrate with CuSO4 solution is considered as a two-step process. First, it deposits the layer from copper sulfate solution on the backside of sapphire substrate by 1064 nm laser irradiation. Then it is followed by the absorption of deposited layer to laser irradiation, resulting in the etching of the sapphire. Therefore, the material removal of LIBWE is based on laser interaction with multilayer materials (sapphire substrate-deposition layer-liquid solution). A three-dimensional thermal model is established to simulate the material removal during the LIBWE process by considering the material data variations of temperature, enthalpy change and latent heat fusion. The model can predict the groove shape influenced by the laser processing parameters (laser fluence, scanning velocity and scanning pass). The simulation results indicate that the groove depth increases with the decreasing of scanning velocity, the increasing of laser fluence and the scanning pass. The groove width is comparable with the focal beam diameter. Some peaks and valleys occur at the bottom of the groove. A comparison between the modeling and experiment indicates that the groove shape in simulation agrees well with the experiment data at laser pulse energy of 4.3 mJ/pulse, scanning velocity of 15 mm/s and the scanning pass of 4. i.e, the present physical model is effective and feasible.

  12. Bioactive glass surface for fiber reinforced composite implants via surface etching by Excimer laser.

    PubMed

    Kulkova, Julia; Moritz, Niko; Huhtinen, Hannu; Mattila, Riina; Donati, Ivan; Marsich, Eleonora; Paoletti, Sergio; Vallittu, Pekka K

    2016-07-01

    Biostable fiber-reinforced composites (FRC) prepared from bisphenol-A-glycidyldimethacrylate (BisGMA)-based thermosets reinforced with E-glass fibers are promising alternatives to metallic implants due to the excellent fatigue resistance and the mechanical properties matching those of bone. Bioactive glass (BG) granules can be incorporated within the polymer matrix to improve the osteointegration of the FRC implants. However, the creation of a viable surface layer using BG granules is technically challenging. In this study, we investigated the potential of Excimer laser ablation to achieve the selective removal of the matrix to expose the surface of BG granules. A UV-vis spectroscopic study was carried out to investigate the differences in the penetration of light in the thermoset matrix and BG. Thereafter, optimal Excimer laser ablation parameters were established. The formation of a calcium phosphate (CaP) layer on the surface of the laser-ablated specimens was verified in simulated body fluid (SBF). In addition, the proliferation of MG63 cells on the surfaces of the laser-ablated specimens was investigated. For the laser-ablated specimens, the pattern of proliferation of MG63 cells was comparable to that in the positive control group (Ti6Al4V). We concluded that Excimer laser ablation has potential for the creation of a bioactive surface on FRC-implants. Copyright © 2016 IPEM. Published by Elsevier Ltd. All rights reserved.

  13. Laser Doppler velocimetry using a modified computer mouse

    NASA Astrophysics Data System (ADS)

    Zaron, Edward D.

    2016-10-01

    A computer mouse has been modified for use as a low-cost laser Doppler interferometer and used to measure the two-component fluid velocity of a flowing soap film. The mouse sensor contains two vertical cavity surface emitting lasers, photodiodes, and signal processing hardware integrated into a single package, approximately 1 cm2 in size, and interfaces to a host computer via a standard USB port. Using the principle of self-mixing interferometry, whereby laser light re-enters the laser cavity after being scattered from a moving target, the Doppler shift and velocity of scatterers dispersed in the flow are measured. Observations of the boundary layer in a turbulent soap film channel flow demonstrate the capabilities of the sensor.

  14. Influence of Nd:YAG laser on the bond strength of self-etching and conventional adhesive systems to dental hard tissues.

    PubMed

    Marimoto, A K; Cunha, L A; Yui, K C K; Huhtala, M F R L; Barcellos, D C; Prakki, A; Gonçalves, S E P

    2013-01-01

    The aim of this study was to investigate the influence of Nd:YAG laser on the shear bond strength to enamel and dentin of total and self-etch adhesives when the laser was applied over the adhesives, before they were photopolymerized, in an attempt to create a new bonding layer by dentin-adhesive melting. One-hundred twenty bovine incisors were ground to obtain flat surfaces. Specimens were divided into two substrate groups (n=60): substrate E (enamel) and substrate D (dentin). Each substrate group was subdivided into four groups (n=15), according to the surface treatment accomplished: X (Xeno III self-etching adhesive, control), XL (Xeno III + laser Nd:YAG irradiation at 140 mJ/10 Hz for 60 seconds + photopolymerization, experimental), S (acid etching + Single Bond conventional adhesive, Control), and SL (acid etching + Single Bond + laser Nd:YAG at 140 mJ/10 Hz for 60 seconds + photopolymerization, experimental). The bonding area was delimited with 3-mm-diameter adhesive tape for the bonding procedures. Cylinders of composite were fabricated on the bonding area using a Teflon matrix. The teeth were stored in water at 37°C/48 h and submitted to shear testing at a crosshead speed of 0.5 mm/min in a universal testing machine. Results were analyzed with three-way analysis of variance (ANOVA; substrate, adhesive, and treatment) and Tukey tests (α=0.05). ANOVA revealed significant differences for the substrate, adhesive system, and type of treatment: lased or unlased (p<0.05). The mean shear bond strength values (MPa) for the enamel groups were X=20.2 ± 5.61, XL=23.6 ± 4.92, S=20.8 ± 4.55, SL=22.1 ± 5.14 and for the dentin groups were X=14.1 ± 7.51, XL=22.2 ± 6.45, S=11.2 ± 5.77, SL=15.9 ± 3.61. For dentin, Xeno III self-etch adhesive showed significantly higher shear bond strength compared with Single Bond total-etch adhesive; Nd:YAG laser irradiation showed significantly higher shear bond strength compared with control (unlased). Nd:YAG laser application

  15. In vitro analysis of riboflavin-modified, experimental, two-step etch-and-rinse dentin adhesive: Fourier transform infrared spectroscopy and micro-Raman studies.

    PubMed

    Daood, Umer; Swee Heng, Chan; Neo Chiew Lian, Jennifer; Fawzy, Amr S

    2015-06-26

    To modify two-step experimental etch-and-rinse dentin adhesive with different concentrations of riboflavin and to study its effect on the bond strength, degree of conversion, along with resin infiltration within the demineralized dentin substrate, an experimental adhesive-system was modified with different concentrations of riboflavin (m/m, 0, 1%, 3%, 5% and 10%). Dentin surfaces were etched with 37% phosphoric acid, bonded with respective adhesives, restored with restorative composite-resin, and sectioned into resin-dentin slabs and beams to be stored for 24 h or 9 months in artificial saliva. Micro-tensile bond testing was performed with scanning electron microscopy to analyse the failure of debonded beams. The degree of conversion was evaluated with Fourier transform infrared spectroscopy (FTIR) at different time points along with micro-Raman spectroscopy analysis. Data was analyzed with one-way and two-way analysis of variance followed by Tukey's for pair-wise comparison. Modification with 1% and 3% riboflavin increased the micro-tensile bond strength compared to the control at 24 h and 9-month storage with no significant differences in degree of conversion (P<0.05). The most predominant failure mode was the mixed fracture among all specimens except 10% riboflavin-modified adhesive specimens where cohesive failure was predominant. Raman analysis revealed that 1% and 3% riboflavin adhesives specimens showed relatively higher resin infiltration. The incorporation of riboflavin in the experimental two-step etch-and-rinse adhesive at 3% (m/m) improved the immediate bond strengths and bond durability after 9-month storage in artificial saliva without adversely affecting the degree of conversion of the adhesive monomers and resin infiltration.

  16. In vitro analysis of riboflavin-modified, experimental, two-step etch-and-rinse dentin adhesive: Fourier transform infrared spectroscopy and micro-Raman studies

    PubMed Central

    Daood, Umer; Swee Heng, Chan; Neo Chiew Lian, Jennifer; Fawzy, Amr S

    2015-01-01

    To modify two-step experimental etch-and-rinse dentin adhesive with different concentrations of riboflavin and to study its effect on the bond strength, degree of conversion, along with resin infiltration within the demineralized dentin substrate, an experimental adhesive-system was modified with different concentrations of riboflavin (m/m, 0, 1%, 3%, 5% and 10%). Dentin surfaces were etched with 37% phosphoric acid, bonded with respective adhesives, restored with restorative composite–resin, and sectioned into resin–dentin slabs and beams to be stored for 24 h or 9 months in artificial saliva. Micro-tensile bond testing was performed with scanning electron microscopy to analyse the failure of debonded beams. The degree of conversion was evaluated with Fourier transform infrared spectroscopy (FTIR) at different time points along with micro-Raman spectroscopy analysis. Data was analyzed with one-way and two-way analysis of variance followed by Tukey's for pair-wise comparison. Modification with 1% and 3% riboflavin increased the micro-tensile bond strength compared to the control at 24 h and 9-month storage with no significant differences in degree of conversion (P<0.05). The most predominant failure mode was the mixed fracture among all specimens except 10% riboflavin-modified adhesive specimens where cohesive failure was predominant. Raman analysis revealed that 1% and 3% riboflavin adhesives specimens showed relatively higher resin infiltration. The incorporation of riboflavin in the experimental two-step etch-and-rinse adhesive at 3% (m/m) improved the immediate bond strengths and bond durability after 9-month storage in artificial saliva without adversely affecting the degree of conversion of the adhesive monomers and resin infiltration. PMID:25257880

  17. Effects of texturization due to chemical etching and laser on the optical properties of multicrystalline silicon for applications in solar cells

    NASA Astrophysics Data System (ADS)

    Vera, D.; Mass, J.; Manotas, M.; Cabanzo, R.; Mejia, E.

    2016-02-01

    In this work we carried out the texturization of surfaces of multicrystalline silicon type-p in order to decrease the reflection of light on the surface, using the chemical etching method and then a treatment with laser. In the first method, it was immersed in solutions of HF:HNO3:H2O, HF:HNO3:CH3COOH, HF:HNO3:H3PO4, in the proportion 14:01:05, during 30 seconds, 1, 2 and 3 minutes. Subsequently with a laser (ND:YAG) grids were generated beginning with parallel lines separated 50μm. The samples were analyzed by means of diffuse spectroscopy (UV-VIS) and scanning electron micrograph (SEM) before and after the laser treatment. The lowest result of reflectance obtained by HF:HNO3:H2O during 30 seconds, was of 15.5%. However, after applying the treatment with laser the reflectance increased to 17.27%. On the other hand, the samples treated (30 seconds) with acetic acid and phosphoric acid as diluents gives as a result a decrease in the reflectance values after applying the laser treatment from 21.97% to 17.79% and from 27.73% to 20.03% respectively. The above indicates that in some cases it is possible to decrease the reflectance using jointly the method of chemical etching and then a laser treatment.

  18. A modified pump laser system to pump the titanium sapphire laser

    NASA Technical Reports Server (NTRS)

    Petway, Larry B.

    1990-01-01

    As a result of the wide tunability of the titanium sapphire laser NASA has sited it to be used to perform differential absorption lidar (DIAL) measurements of H2O vapor in the upper and lower troposphere. The titanium sapphire laser can provide a spectrally narrow (0.3 to 1.0 pm), high energy (0.5 to 1.0 J) output at 727, 762, and 940 nm which are needed in the DIAL experiments. This laser performance can be obtained by addressing the line-narrowing issues in a master oscillator and the high energy requirement in a fundamental mode oscillator. By injection seeding, the single frequency property of the master oscillator can produce a line narrow high energy power oscillator. A breadboard model of the titanium sapphire laser that will ultimately be used in NASA lidar atmospheric sensing experiment is being designed. The task was to identify and solve any problem that would arise in the actual laser system. One such problem was encountered in the pump laser system. The pump laser that is designed to pump both the master oscillator and power oscillator is a Nd:YLF laser. Nd:YLF exhibits a number of properties which renders this material an attractive option to be used in the laser system. The Nd:YLF crystal is effectively athermal; it produces essentially no thermal lensing and thermally induced birefringence is generally insignificant in comparison to the material birefringence resulting from the uniaxial crystal structure. However, in application repeated fracturing of these laser rods was experience. Because Nd:YLF rods are not commercially available at the sizes needed for this application a modified pump laser system to replace the Nd:YLF laser rod was designed to include the more durable Nd:YAG laser rods. In this design, compensation for the thermal lensing effect that is introduced because of the Nd:YAG laser rods is included.

  19. Laser ignition of elastomer-modified cast double-base (EMCDB) propellant using a diode laser

    NASA Astrophysics Data System (ADS)

    Herreros, Dulcie N.; Fang, Xiao

    2017-03-01

    An experimental study was conducted to investigate laser ignition using a diode laser for elastomer-modified cast double-base (EMCDB) propellant in order to develop more liable and greener laser ignitors for direct initiation of the propellant. Samples of the propellant were ignited using a 974 nm near-infrared diode laser. Laser beam parameters including laser power, beam width and pulse width were investigated to determine their effects on the ignition performance in terms of delay time, rise time and burn time of the propellant which was arranged in several different configurations. The results have shown that the smaller beam widths, longer pulse widths and higher laser powers resulted in shorter ignition delay times and overall burn times, however, there came a point at which increasing the amount of laser energy transferred to the material resulted in no significant reduction in either delay time or overall burn time. The propellant tested responded well to laser ignition, a discovery which supports continued research into the development of laser-based propellant ignitors.

  20. A study of laser-induced blue emission with nanosecond decay of silicon nanoparticles synthesized by a chemical etching method.

    PubMed

    Bagabas, Abdulaziz A; Gondal, Mohammed A; Dastageer, Mohammed A; Al-Muhanna, Abdulrahman A; Alanazi, Thaar H; Ababtain, Moath A

    2009-09-02

    Silicon nanoparticles (Si NPs), exhibiting a strong visible photoluminescence (PL), have found many applications in optoelectronics devices, biomedical tags and flash memories. Chemical etching is a well-known method for synthesizing orange-luminescent, hydride-capped silicon nanoparticles (H/Si NPs). However, a blueshift in emission wavelength occurs when reducing the particle size to exciton Bohr radius or less. In this paper, we attempted to synthesize and characterize H/Si NPs that emit lower wavelengths at room temperature. We proved that our method succeeded in synthesizing H/Si NPs with emission in the blue region. The wavelength-resolved and time-resolved studies of the PL were executed for H/Si NPs in methanol (MeOH), pyridine (py) and furan, using the 355 nm pulsed radiation from a Nd:YAG laser. In addition, excitation wavelength-dependent and PL studies were executed using the spectrofluorometer with a xenon (Xe) broad band light source. We noticed solvent-dependent PL spectra with sharp peaks near 420 nm and a short lifetime less than 100 ns. The morphology and particle size were investigated by high resolution transmission electron microscope (HRTEM). Particles as small as one nanometer were observed in MeOH and py suspensions while two-nanometer particles were observed in the furan suspension.

  1. Topography-based surface tension gradients to facilitate water droplet movement on laser-etched copper substrates.

    PubMed

    Sommers, A D; Brest, T J; Eid, K F

    2013-09-24

    This paper describes a method for creating a topography-based gradient on a metallic surface to help mitigate problems associated with condensate retention. The gradient was designed to promote water droplet migration toward a specified region on the surface which would serve as the primary conduit for drainage using only the roughness of the surface to facilitate the movement of the droplets. In this work, parallel microchannels having a fixed land width but variable spacing were etched into copper substrates to create a surface tension gradient along the surface of the copper. The surfaces were fabricated using a 355 nm Nd:YVO4 laser system and then characterized using spray testing techniques and water droplet (2-10 μL) injection via microsyringe. The distances that individual droplets traveled on the gradient surface were also measured using a goniometer and CCD camera and were found to be between 0.5 and 1.5 mm for surfaces in a horizontal orientation. Droplet movement was spontaneous and did not require the use of chemical coatings. The theoretical design and construction of surface tension gradients were also explored in this work by calculating the minimum gradient needed for droplet movement on a horizontal surface using Wenzel's model of wetting. The results of this study suggest that microstructural patterning could be used to help reduce condensate retention on metallic fins such as those used in heat exchangers in heating, ventilation, air-conditioning, and refrigeration (HVAC&R) applications.

  2. Rapid 2D incoherent mirror fabrication by laser interference lithography and wet etching for III-V MQW solar cells

    NASA Astrophysics Data System (ADS)

    Wang, Wei; Freundlich, Alex

    2016-03-01

    Optimization of non-planar antireflective coating and back- (or front-) surface texturing are widely studied as advanced light management approach to further reduce the reflection losses and increase the sunlight absorption path in solar cells. Rear reflectors have been developed from coherent mirrors to incoherent mirrors in order to further increase light path, which can significantly improve the efficiency and allow for much thinner devices. A Lambertian surface, which has the most random texture, can theoretically raise the light path to 4n2 times that of a smooth surface. It's a challenge however to fabricate ideal Lambertian texture, especially in a fast and low cost way. In this work, a method is developed to overcome this challenge that combines the use of laser interference lithography (LIL) and selective wet etching. This approach allows for a rapid (10 min) wafer scale (3 inch wafer) texture processing with sub-wavelength (nano)-scale control of the pattern and the pitch. The technique appears as being particularly attractive for the development of ultrathin III-V devices, or in overcoming the weak sub-bandgap absorption in devices incorporating quantum dots or quantum wells. The structure of the device is demonstrated, without affecting active layers.

  3. Uniform nano-ripples on the sidewall of silicon carbide micro-hole fabricated by femtosecond laser irradiation and acid etching

    SciTech Connect

    Khuat, Vanthanh; Chen, Tao; Gao, Bo; Si, Jinhai Ma, Yuncan; Hou, Xun

    2014-06-16

    Uniform nano-ripples were observed on the sidewall of micro-holes in silicon carbide fabricated by 800-nm femtosecond laser and chemical selective etching. The morphology of the ripple was analyzed using scanning electronic microscopy. The formation mechanism of the micro-holes was attributed to the chemical reaction of the laser affected zone with mixed solution of hydrofluoric acid and nitric acid. The formation of nano-ripples on the sidewall of the holes could be attributed to the standing wave generated in z direction due to the interference between the incident wave and the reflected wave.

  4. Evaluation of the tensile bond strength of an adhesive system self-etching in dentin irradiated with Er:YAG laser

    NASA Astrophysics Data System (ADS)

    de Mello, Andrea M. D.; Mello, Fabiano A. S.; Matson, Edmir; Mattos, Adriana B.; Mello, Guilerme S.

    2001-04-01

    Since Buonocore, several researchers have been seeking for the best adhesive system and treatment for the enamel and dentin surfaces. The use of the acid has been presented as one of the best techniques of dentin conditioning, because this promotes the removal of the 'smear layer' and exhibition of dentinal structure, for a best penetration and micro-retention of the adhesive system. However, some conditioning methods have been appearing in the literature, for the substitution or interaction with the acid substances, as the laser. The objective of this work is to evaluate the tensile bond strength of the adhesive system 'self-etching' associated to a composed resin, in dentin surfaces conditioned with the Er:YAG laser. For this study, freshly extracted human teeth were used and in each one the dentinal surfaces, which were treated with three sandpapers of different granulations to obtain a standard of the smear layer, before the irradiation of the laser and of the restoring procedure. After these procedures the specimens were storage in distilled water at 37 degrees for 24 hours. Soon after, they were submitted to the tensile strength test. After analyzing the results, we can conclude that the use of the Er:YAG laser can substitute the drill without the need of conditioning, when using the adhesive system 'self etching' in the dentinal surfaces because there was a decline in the strength of adhesion in the groups conditioned with the laser.

  5. Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

    PubMed Central

    2011-01-01

    Nanostructuring of ultrathin HfO2 films deposited on GaAs (001) substrates by high-resolution Lloyd's mirror laser interference nanolithography is described. Pattern transfer to the HfO2 film was carried out by reactive ion beam etching using CF4 and O2 plasmas. A combination of atomic force microscopy, high-resolution scanning electron microscopy, high-resolution transmission electron microscopy, and energy-dispersive X-ray spectroscopy microanalysis was used to characterise the various etching steps of the process and the resulting HfO2/GaAs pattern morphology, structure, and chemical composition. We show that the patterning process can be applied to fabricate uniform arrays of HfO2 mesa stripes with tapered sidewalls and linewidths of 100 nm. The exposed GaAs trenches were found to be residue-free and atomically smooth with a root-mean-square line roughness of 0.18 nm after plasma etching. PACS: Dielectric oxides 77.84.Bw, Nanoscale pattern formation 81.16.Rf, Plasma etching 52.77.Bn, Fabrication of III-V semiconductors 81.05.Ea PMID:21711946

  6. Fabrication of nanostructured silicon by metal-assisted etching and its effects on matrix-free laser desorption/ionization mass spectrometry.

    PubMed

    Chen, W Y; Huang, J T; Cheng, Y C; Chien, C C; Tsao, C W

    2011-02-21

    A matrix-free, high sensitivity, nanostructured silicon surface assisted laser desorption/ionization mass spectrometry (LDI-MS) method fabricated by metal-assisted etching was investigated. Effects of key process parameters, such as etching time, substrate resistance and etchant composition, on the nanostructured silicon formation and its LDI-MS efficiency were studied. The results show that the nanostructured silicon pore depth and size increase with etching time, while MS ion intensity increases with etching time to 300 s then decreases until 600 s for both low resistance (0.001-0.02Ωcm) and high resistance (1-100Ωcm) silicon substrates. The nanostructured silicon surface morphologies were found to directly affect the LDI-MS signal ion intensity. By characterizing the nanostructured silicon surface roughness using atomic force microscopy (AFM) and sample absorption efficiency using fluorescence microscopy, it was further demonstrated that the nanostructured silicon surface roughness was highly correlated to the LDI-MS performance.

  7. Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

    NASA Astrophysics Data System (ADS)

    Benedicto, Marcos; Galiana, Beatriz; Molina-Aldareguia, Jon M.; Monaghan, Scott; Hurley, Paul K.; Cherkaoui, Karim; Vazquez, Luis; Tejedor, Paloma

    2011-05-01

    Nanostructuring of ultrathin HfO2 films deposited on GaAs (001) substrates by high-resolution Lloyd's mirror laser interference nanolithography is described. Pattern transfer to the HfO2 film was carried out by reactive ion beam etching using CF4 and O2 plasmas. A combination of atomic force microscopy, high-resolution scanning electron microscopy, high-resolution transmission electron microscopy, and energy-dispersive X-ray spectroscopy microanalysis was used to characterise the various etching steps of the process and the resulting HfO2/GaAs pattern morphology, structure, and chemical composition. We show that the patterning process can be applied to fabricate uniform arrays of HfO2 mesa stripes with tapered sidewalls and linewidths of 100 nm. The exposed GaAs trenches were found to be residue-free and atomically smooth with a root-mean-square line roughness of 0.18 nm after plasma etching. PACS: Dielectric oxides 77.84.Bw, Nanoscale pattern formation 81.16.Rf, Plasma etching 52.77.Bn, Fabrication of III-V semiconductors 81.05.Ea

  8. Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application.

    PubMed

    Benedicto, Marcos; Galiana, Beatriz; Molina-Aldareguia, Jon M; Monaghan, Scott; Hurley, Paul K; Cherkaoui, Karim; Vazquez, Luis; Tejedor, Paloma

    2011-05-31

    Nanostructuring of ultrathin HfO2 films deposited on GaAs (001) substrates by high-resolution Lloyd's mirror laser interference nanolithography is described. Pattern transfer to the HfO2 film was carried out by reactive ion beam etching using CF4 and O2 plasmas. A combination of atomic force microscopy, high-resolution scanning electron microscopy, high-resolution transmission electron microscopy, and energy-dispersive X-ray spectroscopy microanalysis was used to characterise the various etching steps of the process and the resulting HfO2/GaAs pattern morphology, structure, and chemical composition. We show that the patterning process can be applied to fabricate uniform arrays of HfO2 mesa stripes with tapered sidewalls and linewidths of 100 nm. The exposed GaAs trenches were found to be residue-free and atomically smooth with a root-mean-square line roughness of 0.18 nm after plasma etching.PACS: Dielectric oxides 77.84.Bw, Nanoscale pattern formation 81.16.Rf, Plasma etching 52.77.Bn, Fabrication of III-V semiconductors 81.05.Ea.

  9. Effect of blood contamination on shear bond strength of brackets bonded with a self-etching primer combined with a resin-modified glass ionomer.

    PubMed

    Cacciafesta, Vittorio; Sfondrini, Maria Francesca; Scribante, Andrea; De Angelis, Marco; Klersy, Catherine

    2004-12-01

    This study assessed the effect of blood contamination on the shear bond strength and bond failure site of a resin-modified glass ionomer (Fuji Ortho LC, GC Europe, Leuven, Belgium) used with 3 enamel conditioners (10% polyacrylic acid, 37% phosphoric acid, and self-etching primer). One hundred twenty bovine permanent mandibular incisors were randomly divided into 8 groups; each group consisted of 15 specimens. Two enamel surface conditions were studied: dry and contaminated with blood. One hundred twenty stainless steel brackets were bonded with the resin-modified glass ionomer. After bonding, all samples were stored in distilled water for 24 hours and then tested in shear mode on a testing machine. The groups conditioned with self-etching primer and 37% phosphoric acid had the highest bond strengths for both dry and blood-contaminated enamel. The groups conditioned with 10% polyacrylic acid showed significantly lower shear bond strength value, and the unconditioned groups had the lowest bond strengths. For each enamel conditioner, no significant difference was reported between dry and blood-contaminated groups. Significant differences in debond locations were found among the groups bonded with the different conditioners. Blood contamination of enamel during the bonding procedure of Fuji Ortho LC did not affect its bond strength values, no matter which enamel conditioner was used.

  10. Comparison of the shear bond strength of orthodontic brackets in bonding and rebonding: preparation with laser versus conventional acid etch technique.

    PubMed

    Oshagh, Morteza; Pakshir, Hamid Reza; Najafi, H Zarif; Naseri, Mohammad Mehdi; Nasrabadi, N Iraji; Torkan, Sepideh

    2013-08-01

    The purpose of this study was to compare the bond strength of orthodontic brackets using laser versus acid etching. Debonding of brackets is a common problem in orthodontic treatments. Eighty extracted premolar teeth were divided into two groups. The enamel of the teeth in group A and B were etched using CO2 laser and phosphoric acid, respectively. The brackets were bonded to the teeth using Transbond XT and then debonded from the teeth by Instron machine. The remaining composite on the tooth surface was removed by a tungsten carbide polishing bur. Both groups were divided into two subgroups (A1, A2 and B1, B2). The teeth were prepared again with laser in A1, B1 subgroups and with acid in A2, B2 subgroups. At each stage, the shear bond strength and residual adhesive index were measured. One way ANOVA and χ(2) tests were used to analyze data. The mean shear bond strength was significantly lower in group A and higher in group B compared with all other groups (p < 0.05). Most of the bond failures were degree 0 and 1 in groups A, A1, and B1, and degree 2 and 3 in groups B, A2, and B2. Primary preparation with acid has a higher bond strength value than does CO2 laser. Less adhesive residue remained on enamel after tooth preparation with laser following debonding. Secondary preparation of the enamel using laser has higher bond strength value than does primary preparation with laser, which can rationalize use of laser in rebonding of brackets.

  11. Effect of laser and air abrasion pretreatment on the microleakage of a fissure sealant applied with conventional and self etch adhesives.

    PubMed

    Tirali, R E; Celik, C; Arhun, N; Berk, G; Cehreli, S B

    2013-01-01

    The purpose of this study was to investigate the effects of different pretreatment protocols along with different bonding agents on the microleakage of a fissure sealant material. A total of 144 freshly extracted noncarious human third molars were used The teeth were randomly assigned into three groups with respect to the pretreatment protocol employed: A. Air Abrasion B. Er,Cr:YSGG laser C. No pretreatment (Control). In each group specimens were further subjected to one of the following procedures before application of the sealant: 1. %36 Phosphoric acid-etch (AE) (DeTrey Conditioner 36/Denstply, UK) 2.AE+Prime&Bond NT (Dentsply, UK) 3. Clearfil S3 Bond (Kuraray, Japan) 4. Clearfil SE Bond (Kuraray, Japan). All teeth were sealed with the same fissure sealant material (Conseal F/SDI, Australia). Sealed teeth were further subjected to thermocycling, dye penetration test, sectioning and quantitative image analysis. Statistical evaluation of the microleakage data was performed with two way independent ANOVA and multiple comparisons test at p = 0.05. For qualitative evaluation 2 samples from each group were examined under Scanning Electron Microscopy. Microleakage was affected by both the type of pretreatment and the subsequent bonding protocols employed (p < 0.05). Overall, the highest (Mean = 0.36 mm) and lowest (Mean = 0.06 mm) microleakage values were observed in samples with unpretreated enamel sealed by S3+Conseal F and samples with laser pretreated enamel sealed by Acid Etch+Prime&-Bond+Conseal F protocols, respectively (p < 0.05). In the acid-etch group samples pretreated with laser yielded in slightly lower microleakage scores when compared with unpretreated samples and samples pretreated with air abrasion but the statistical significance was not important (p = 0,179). Similarly, when bonding agent is applied following acid-etching procedure, microleakage scores were not affected from pretreatment protocol (p = 0,615) (intact enamel/laser or air-abrasion). For

  12. Morphology of resin-dentin interfaces after Er,Cr:YSGG laser and acid etching preparation and application of different bonding systems.

    PubMed

    Beer, Franziska; Buchmair, Alfred; Körpert, Wolfram; Marvastian, Leila; Wernisch, Johann; Moritz, Andreas

    2012-07-01

    The goal of this study was to show the modifications in the ultrastructure of the dentin surface morphology following different surface treatments. The stability of the adhesive compound with dentin after laser preparation compared with conventional preparation using different bonding agents was evaluated. An Er,Cr:YSGG laser and 36% phosphoric acid in combination with various bonding systems were used. A total of 100 caries-free human third molars were used in this study. Immediately after surgical removal teeth were cut using a band saw and 1-mm thick dentin slices were created starting at a distance of 4 mm from the cusp plane to ensure complete removal of the enamel. The discs were polished with silicon carbide paper into rectangular shapes to a size of 6 × 4 mm (±0,2 mm).The discs as well as the remaining teeth stumps were stored in 0.9% NaCl at room temperature. The specimens were divided into three main groups (group I laser group, group II etch group, group III laser and etch group) and each group was subdivided into three subgroups which were allocated to the different bonding systems (subgroup A Excite, subgroup B Scotchbond, subgroup C Syntac). Each disc and the corresponding tooth stump were treated in the same way. After preparation the bonding composite material was applied according to the manufacturers' guidelines in a hollow tube of 2 mm diameter to the disc as well as to the corresponding tooth stump. Shear bond strength testing and environmental scanning electron microscopy were used to assess the morphology and stability of the resin-dentin interface. The self-etching bonding system showed the highest and the most constant shear values in all three main groups, thus enabling etching with phosphoric acid after laser preparation to be avoided. Thus we conclude that laser preparation creates a surface texture that allows prediction of the quality of the restoration without the risk of negative influences during the following treatment steps. This

  13. Acid etching concentration as a strategy to improve the adhesive performance on Er:YAG laser and bur-prepared demineralized enamel.

    PubMed

    Guedes, Sarah F F; Melo, Mary Anne S; Lima, Juliana P M; Ely, Caroline; Rôla, Antero J S; Piva, Evandro; Rodrigues, Lidiany K A

    2014-07-01

    This study investigated the effect of phosphoric acid concentration on microshear bond strength (μSBS) of an etch-and-rinse adhesive system to demineralized irradiated enamel. Er:YAG laser irradiation may increase acid resistance of enamel; however, its use is associated with reduced bonding effectiveness. Three experimental etching agents and one bonding agent were fabricated. Enamel pretreatment was tested in two levels (bur and laser) and phosphoric acid was tested in four levels (control and at 35, 45, or 55%). Commercially available phosphoric acid and a bonding agent were used as control. Enamel samples were submitted to a pH-cycling model to induce demineralization. Half of the exposed demineralized enamel area was prepared with diamond bur and half was prepared with an Er:YAG laser (λ=2.94 μm, 300 mJ, 2 Hz). Specimens were randomly allocated to receive different acid etching concentrations and either the experimental or the commercial adhesive system. Microshear bond strength and the adhesive remnant index (ARI) scores were determined. μSBS's data were evaluated by two way analysis of variance (ANOVA) and Tukey's test. Kruskal-Wallis followed by Dunn's method and Mann-Whitney test were used for ARI comparisons (α=5%). For μSBS, no significant difference among the groups was found, either for phosphoric acid concentration or surface preparation. For ARI scores, statistically higher resin retention was found for lased groups (p<0.001). The increase of phosphoric acid concentration did not impair bond strength regardless of surface preparation; however, increased retention was found when demineralized enamel was prepared with laser.

  14. Histometric analysis and topographic characterization of cp Ti implants with surfaces modified by laser with and without silica deposition.

    PubMed

    Souza, Francisley Á; Queiroz, Thallita P; Sonoda, Celso K; Okamoto, Roberta; Margonar, Rogério; Guastaldi, Antônio C; Nishioka, Renato S; Garcia Júnior, Idelmo R

    2014-11-01

    Biologic behavior of the bone tissue around implants with four different surfaces was evaluated. The surfaces were: modified by laser (LS); modified by laser with sodium silicate deposition (SS); and commercially available surfaces modified by acid etching (AS) and machined surface (MS). Topographic characterization of the surfaces was performed by scanning electron microscopy (SEM)- energy dispersive X-ray spectrometry (EDX) before experimental surgery. Thirty rabbits received 60 implants in their right and left tibias, 1 implant of each surface being placed in each tibia. The analyzed periods were 4, 8, and 12 weeks postoperatively. Histometric analysis was performed evaluating bone interface contact (BIC) and bone area (BA). The results obtained were submitted to the analysis of variance and the Tukey t-test. The elemental mapping was evaluated by means of SEM at 4 weeks postoperatively. The topographic characterization showed differences between the analyzed surfaces. Generally, the BIC and BA of LS and SS implants were statistically higher than those of AS and MS in most of the analyzed periods. Elemental mapping showed high peaks of calcium and phosphorous in all groups. Based on the present methodology, it may be concluded that experimental modifications LS and SS accelerated the stages of the bone tissue repair process around the implants, providing the highest degree of osseointegration. © 2014 Wiley Periodicals, Inc.

  15. Hydrogen evolution at a Pt-modified InP photoelectrode: Improvement of current-voltage characteristics by HCl etching

    SciTech Connect

    Kobayashi, Hikaru; Mizuno, Fumiaki; Nakato, Yoshihiro; Tsubomura, Hiroshi )

    1991-01-24

    Hydrogen photoevolution at p-InP electrodes coated with platinum and palladium has been studied. Efficient and stable solar to chemical energy conversion has been achieved after etching the electrodes with concentrated HCl. The current-voltage (I-V) behavior of the as-prepared electrode covered with a continuous Pt layer is poor, due probably to the presence of defect states in InP. The photocurrent density of this electrode decreases with time under illumination, presumably due to an increase in the defect density. After etching of the electrode with concentrated HCl, the barrier height is increased to 1.0 V, and the I-V characteristics are improved remarkably, showing no degradation under illumination. SEM, XPS, and AES analyses show that the concentrated HCl solution dissolves the InP substrate in the InP/Pt interfacial region, and simultaneously part of the Pt is removed from the InP surface. The I-V characteristics of the Pt-deposited electrodes are unaffected by hydrogen or nitrogen bubbling and the reason is discussed.

  16. Confocal laser spectroscopy of glasses modified by ultrashort laser pulses for waveguide fabrication

    NASA Astrophysics Data System (ADS)

    Chan, James Wai-Jeung

    2002-08-01

    The work described in this thesis involves the fabrication of waveguiding structures inside glasses using femtosecond (fs) laser pulses and the study of the different atomic scale changes associated with refractive index modification that occur in the fs laser modified glasses. This study helps elucidate the possible processes that occur during fs laser writing of waveguides in glasses. Waveguide writing inside fused silica and phosphate glass using focused fs laser pulses has been demonstrated. The modification induced inside both glasses is determined to be different. Inside fused silica, the modification involves a single high index region while inside the phosphate glass (IOG-1, Schott Glass Technologies, Inc.), the modification results in a central, low index, non-guiding region bordered by two, high index, waveguiding regions. The waveguides inside both glasses have an index change on the order of 10 -4. Color center defects have been identified in modified glasses using confocal fluorescence spectroscopy. Modified fused silica exhibits a fluorescence band at 630 nm and at 540 nm, which are attributed to the non-bridging oxygen hole center (NBOHC) and oxygen vacancy defects created by the fs pulses. A fluorescence band at 600 nm is observed in modified phosphate glass, which is assigned to the phosphorus oxygen hole center (POHC) defect. A quantitative analysis of the photobleaching of these defects with exposure to 488 nm light is conducted. Fluorescence imaging of the modified materials is performed to elucidate the location of these defects within the exposed regions in the glass. Using confocal Raman spectroscopy, atomic scale structural changes in the glass network of modified fused silica are reported and correlated to the changes in the physical properties of the material. The changes in the Raman spectrum of modified fused silica, specifically increases in the 490 cm-1 and 605 cm-1 peaks, indicate that fs pulses induce densification in fused silica

  17. Laser-assisted focused He+ ion beam induced etching with and without XeF2 gas assist

    SciTech Connect

    Stanford, Michael G.; Mahady, Kyle; Lewis, Brett B.; Fowlkes, Jason D.; Tan, Shida; Livengood, Richard; Magel, Gregory A.; Moore, Thomas M.; Rack, Philip D.

    2016-10-04

    Focused helium ion (He+) milling has been demonstrated as a high-resolution nanopatterning technique; however, it can be limited by its low sputter yield as well as the introduction of undesired subsurface damage. Here, we introduce pulsed laser- and gas-assisted processes to enhance the material removal rate and patterning fidelity. A pulsed laser-assisted He+ milling process is shown to enable high-resolution milling of titanium while reducing subsurface damage in situ. Gas-assisted focused ion beam induced etching (FIBIE) of Ti is also demonstrated in which the XeF2 precursor provides a chemical assist for enhanced material removal rate. In conclusion, a pulsed laser-assisted and gas-assisted FIBIE process is shown to increase the etch yield by ~9× relative to the pure He+ sputtering process. These He+ induced nanopatterning techniques improve material removal rate, in comparison to standard He+ sputtering, while simultaneously decreasing subsurface damage, thus extending the applicability of the He+ probe as a nanopattering tool.

  18. Laser-assisted focused He+ ion beam induced etching with and without XeF2 gas assist

    SciTech Connect

    Stanford, Michael G.; Mahady, Kyle; Lewis, Brett B.; Fowlkes, Jason D.; Tan, Shida; Livengood, Richard; Magel, Gregory A.; Moore, Thomas M.; Rack, Philip D.

    2016-10-04

    Focused helium ion (He+) milling has been demonstrated as a high-resolution nanopatterning technique; however, it can be limited by its low sputter yield as well as the introduction of undesired subsurface damage. Here, we introduce pulsed laser- and gas-assisted processes to enhance the material removal rate and patterning fidelity. A pulsed laser-assisted He+ milling process is shown to enable high-resolution milling of titanium while reducing subsurface damage in situ. Gas-assisted focused ion beam induced etching (FIBIE) of Ti is also demonstrated in which the XeF2 precursor provides a chemical assist for enhanced material removal rate. In conclusion, a pulsed laser-assisted and gas-assisted FIBIE process is shown to increase the etch yield by ~9× relative to the pure He+ sputtering process. These He+ induced nanopatterning techniques improve material removal rate, in comparison to standard He+ sputtering, while simultaneously decreasing subsurface damage, thus extending the applicability of the He+ probe as a nanopattering tool.

  19. Photoluminescence Enhancement and Thermal Performance of Surface Modified Y3Al5O12:Ce3+ Phosphor by Chemical Wet Etching

    NASA Astrophysics Data System (ADS)

    He, Zhijiang; Li, Zebin; Fan, Xiaoxuan; Cheng, Weihai; Ju, Jiaqi; Ou, Qiongrong; Liang, Rongqing

    2013-02-01

    Surface of Y3Al5O12:Ce3+ Phosphor was modified by wet etching in 40% NH4F+CH3COOH (1:1) solution for 5 h. SEM results show that smooth surface of phosphor particles turn rough, and edge angles are less sharp as before. PL determinations indicate that backscattering loss of the excited light reduces by 3.9% and emission power is enhanced by 10.7%. Meanwhile, after the surface modification, YAG phosphor presents a lower temperature decay rate of 1.2% at 373 K, which is well explained by the configurational coordinate diagram. Therefore, this method can greatly enhance the efficient of light conversion, extraction and stabilization of pc-LED.

  20. A novel approach to pseudopodia proteomics: excimer laser etching, two-dimensional difference gel electrophoresis, and confocal imaging

    PubMed Central

    Mimae, Takahiro; Ito, Akihiko; Hagiyama, Man; Nakanishi, Jun; Hosokawa, Yoichiroh; Okada, Morihito; Murakami, Yoshinori; Kondo, Tadashi

    2014-01-01

    Pseudopodia are actin-rich ventral cellular protrusions shown to facilitate the migration and metastasis of tumor cells. Here, we present a novel approach to perform pseudopodia proteomics. Tumor cells growing on porous membranes extend pseudopodia into the membrane pores. In our method, cell bodies are removed by horizontal ablation at the basal cell surface with the excimer laser while pseudopodia are left in the membrane pores. For protein expression profiling, whole cell and pseudopodia proteins are extracted with a lysis buffer, labeled with highly sensitive fluorescent dyes, and separated by two-dimensional gel electrophoresis. Proteins with unique expression patterns in pseudopodia are identified by mass spectrometry. The effects of the identified proteins on pseudopodia formation are evaluated by measuring the pseudopodia length in cancer cells with genetically modified expression of target proteins using confocal imaging. This protocol allows global identification of pseudopodia proteins and evaluation of their functional significance in pseudopodia formation within one month. PMID:25309719

  1. Laterally coupled distributed feedback lasers emitting at 2 μm with quantum dash active region and high-duty-cycle etched semiconductor gratings

    NASA Astrophysics Data System (ADS)

    Papatryfonos, Konstantinos; Saladukha, Dzianis; Merghem, Kamel; Joshi, Siddharth; Lelarge, Francois; Bouchoule, Sophie; Kazazis, Dimitrios; Guilet, Stephane; Le Gratiet, Luc; Ochalski, Tomasz J.; Huyet, Guillaume; Martinez, Anthony; Ramdane, Abderrahim

    2017-02-01

    Single-mode diode lasers on an InP(001) substrate have been developed using InAs/In0.53Ga0.47As quantum dash (Qdash) active regions and etched lateral Bragg gratings. The lasers have been designed to operate at wavelengths near 2 μm and exhibit a threshold current of 65 mA for a 600 μm long cavity, and a room temperature continuous wave output power per facet >5 mW. Using our novel growth approach based on the low ternary In0.53Ga0.47As barriers, we also demonstrate ridge-waveguide lasers emitting up to 2.1 μm and underline the possibilities for further pushing the emission wavelength out towards longer wavelengths with this material system. By introducing experimentally the concept of high-duty-cycle lateral Bragg gratings, a side mode suppression ratio of >37 dB has been achieved, owing to an appreciably increased grating coupling coefficient of κ ˜ 40 cm-1. These laterally coupled distributed feedback (LC-DFB) lasers combine the advantage of high and well-controlled coupling coefficients achieved in conventional DFB lasers, with the regrowth-free fabrication process of lateral gratings, and exhibit substantially lower optical losses compared to the conventional metal-based LC-DFB lasers.

  2. [Substantiating the mechanism of action of modified laser cyclocoagulation].

    PubMed

    Egorov, A E; Andrianova, E V; Kats, D V

    2010-01-01

    The authors studied in an experiment the processes of a limited and controlled inflammatory reaction after modified laser cyclocoagulation (MLCC) and estimated the content of adenosine triphosphate (ATP) and guanosine triphosphate (GTP) in the retina and optic nerve. Hypotensive and trophic MLCC were carried out in 36 grey Shinshilla rabbits (36 eyes) by the standard procedure. Thirty-six pair eyes without MLCC served as a control. Biochemical studies yielded estimates of changes in the content of ATP and GTP in the hypotensive and trophic MLCC and control groups. The experiment showed an increase in the levels of ATP and GTP in nmole. The performed experimental studies proved that ocular exchange processes became activated and the content of ATP and GTP increased.

  3. Comparative Evaluation of the Effect of Laser Etching on the Shear Bond Strength of Crowns Cemented with Two Different Luting Agents: An In Vitro Study.

    PubMed

    Dahiya, Ankur; Gandhi, Paresh; Baba, Nadim Z

    The aim of this study was to compare the shear bond strength of crowns cemented on natural teeth after surface treatment of the enamel with an erbium-doped yttrium aluminum garnet (Er:YAG) laser. Crown preparation was done for 40 full-metal crowns, and wax patterns with loops were cast in a cobalt-chromium alloy. The Er:YAG laser was used for surface treatment of some teeth, and teeth without surface treatment acted as the control. Glass-ionomer and self-adhesive resin luting cements were used for cementation. Shear bond strength was tested using a universal testing machine, and statistical analysis was done using paired t test. Scanning electron microscopy analysis was also carried out to study alterations of the enamel and dentin surfaces. Significant increase in shear strength was noted after laser etching the teeth with Er:YAG laser for both types of cement (P < .0001). The results showed that surface treatment using an Er:YAG laser resulted in significant increase in retention of crowns.

  4. Erbium, chromium:yttrium scandium gallium garnet laser for caries removal: influence on bonding of a self-etching adhesive system.

    PubMed

    Tachibana, Arlene; Marques, Márcia Martins; Soler, Julia Maria Pavan; Matos, Adriana Bona

    2008-10-01

    This study evaluated the influence of the dental substrates obtained after the use of different caries removal techniques on bonding of a self-etching system. Forty, extracted, carious, human molars were ground to expose flat surfaces containing caries-infected dentine surrounded by sound dentine. The caries lesions of the specimens were removed or not (control--G1) either by round steel burs and water-cooled, low speed, handpiece (G2), or by irradiation with an erbium, chromium:yttrium scandium gallium garnet (Er,Cr:YSGG) laser (2W, 20 Hz, 35.38 J/cm(2), fiber G4 handpiece with 0.2826 mm(2), non-contact mode at a 2 mm distance, 70% air/20% water--G3) or using a chemo-mechanical method (Carisolv--G4). Caries-infected, caries-affected and sound dentines were submitted to a bonding system followed by construction of a resin-based composite crown. Hour-glass shaped samples were obtained and submitted to a micro-tensile bond test. The bond strength data were compared by analysis of variance (ANOVA), complemented by Tukey's test (P laser. The highest bond strengths were observed with the sound dentine treated with burs and Carisolv. The bond strengths to caries-affected dentine were similar in all groups. Additionally, bonding to caries-affected dentine of the Er,Cr:YSGG laser and Carisolv groups was similar to bonding to caries-infected dentine. Thus, caries-affected dentine is not an adequate substrate for adhesion. Moreover, amongst the caries removal methods tested, the Er,Cr:YSGG laser irradiation was the poorest in providing a substrate for bonding with the tested self-etching system.

  5. Enhanced performance of solar cells with optimized surface recombination and efficient photon capturing via anisotropic-etching of black silicon

    SciTech Connect

    Chen, H. Y.; Peng, Y. E-mail: py@usst.edu.cn; Hong, M.; Zhang, Y. B.; Cai, Bin; Zhu, Y. M.; Yuan, G. D. E-mail: py@usst.edu.cn; Zhang, Y.; Liu, Z. Q.; Wang, J. X.; Li, J. M.

    2014-05-12

    We report an enhanced conversion efficiency of femtosecond-laser treated silicon solar cells by surface modification of anisotropic-etching. The etching improves minority carrier lifetime inside modified black silicon area substantially; moreover, after the etching, an inverted pyramids/upright pyramids mixed texture surface is obtained, which shows better photon capturing capability than that of conventional pyramid texture. Combing of these two merits, the reformed solar cells show higher conversion efficiency than that of conventional pyramid textured cells. This work presents a way for fabricating high performance silicon solar cells, which can be easily applied to mass-production.

  6. Thermal poling induced second-order nonlinearity in femtosecond- laser-modified fused silica

    SciTech Connect

    An Honglin; Fleming, Simon; McMillen, Benjamin W.; Chen, Kevin P.; Snoke, David

    2008-08-11

    Thermal poling was utilized to induce second-order nonlinearity in regions of fused silica modified by 771 nm femtosecond laser pulses. With second-harmonic microscopy, it was found that the nonlinearity in the laser-modified region was much lower than that in nonmodified regions. This is attributed to a more rigid glass network after irradiation by the femtosecond laser pulses and/or lack of mobile alkali ions. Measurement of the distribution of chemical elements in the femtosecond-laser-modified region in a soda lime glass revealed a lower level of sodium ions.

  7. Evaluation of UV absorption coefficient in laser-modified fused silica

    SciTech Connect

    Negres, R A; Burke, M W; Sutton, S B; DeMange, P; Feit, M D; Demos, S G

    2006-08-21

    Laser-induced damage in transparent dielectrics leads to the formation of laser-modified material as a result of exposure to extreme localized temperatures and pressures. In this work, we used an infrared thermal imaging system in combination with a fluorescence microscope to map the dynamics of the local surface temperature and fluorescence intensity under cw, UV excitation of laser-modified fused silica within a damage site. Based on a thermal diffusion model, we estimate the energy deposited via linear absorption mechanisms and derive the absorption coefficient of the modified material. In addition, irreversible changes in the absorption following extended laser exposure were observed.

  8. Surface characterizations of laser modified biomedical grade NiTi shape memory alloys.

    PubMed

    Pequegnat, A; Michael, A; Wang, J; Lian, K; Zhou, Y; Khan, M I

    2015-05-01

    Laser processing of shape memory alloys (SMAs) promises to enable the multifunctional capabilities needed for medical device applications. Prior to clinical implementation, the surface characterisation of laser processed SMA is essential in order to understand any adverse biological interaction that may occur. The current study systematically investigated two Ni-49.8 at.% Ti SMA laser processed surface finishes, including as-processed and polished, while comparing them to a chemically etched parent material. Spectrographic characterisation of the surface included; X-ray photoelectron spectroscopy (XPS), auger electron spectroscopy (AES), and Raman spectroscopy. Corrosion performance and Ni ion release were also assessed using potentiodynamic cyclic polarization testing and inductively coupled plasma optical emission spectroscopy (ICP-OES), respectively. Results showed that surface defects, including increased roughness, crystallinity and presence of volatile oxide species, overshadowed any possible performance improvements from an increased Ti/Ni ratio or inclusion dissolution imparted by laser processing. However, post-laser process mechanical polishing was shown to remove these defects and restore the performance, making it comparable to chemically etched NiTi material. Copyright © 2015 Elsevier B.V. All rights reserved.

  9. The effect of Er,Cr:YSGG laser irradiation on the push-out bond strength of RealSeal self-etch sealer.

    PubMed

    Ehsani, Sara; Bolhari, Behnam; Etemadi, Ardavan; Ghorbanzadeh, Abdollah; Sabet, Yazdan; Nosrat, Ali

    2013-12-01

    The aim of this study was to evaluate the effect of an erbium, chromium: yttrium-scandium-gallium-garnet (Er,Cr:YSGG) laser on the push-out bond strength of RealSeal Self-Etch (SE) sealer. Various methods are used for smear layer removal in endodontics, such as the application of Er,Cr:YSGG lasers. This laser system may influence the bond strength of resin-based sealers. Sixty single-rooted extracted teeth were selected. After root canal preparation, samples were divided into two experimental groups and one positive control group (n=20 per group). In group 1, the smear layer was removed by irrigation with ethylenediaminetetraacetic acid (EDTA) and sodium hypochlorite (NaOCl). In group 2, the smear layer was removed using a 2.78 μm Er,Cr:YSGG laser with radial firing tips (RFT3) (parameters: 1.5 W, 140 μs, 20 Hz, and 15% water to 15% air ratio), moving at 2 mm/sec in an apico-coronal direction. Group 3 served as a positive control group. Five specimens from each group were selected for scanning electron microscope (SEM) observation. The remaining 45 roots were obturated with RealSeal SE/Resilon and subjected to push-out tests. Data were analyzed using one way analysis of variance (ANOVA) and Tamhane's test. The results showed no significant difference between push-out bond strength of root canal fillings in the EDTA+NaOCl group and the 1.5 W laser group (p>0.05). The positive control group showed the lowest push-out bond strength. The results of the present study indicate that the application of an Er,Cr:YSGG laser with radial firing tips did not adversely affect the push-out bond strength of RealSeal SE sealer to dentin.

  10. The Effect of Er,Cr:YSGG Laser Irradiation on the Push-Out Bond Strength of RealSeal Self-Etch Sealer

    PubMed Central

    Ehsani, Sara; Etemadi, Ardavan; Ghorbanzadeh, Abdollah; Sabet, Yazdan; Nosrat, Ali

    2013-01-01

    Abstract Objective: The aim of this study was to evaluate the effect of an erbium, chromium: yttrium-scandium-gallium-garnet (Er,Cr:YSGG) laser on the push-out bond strength of RealSeal Self-Etch (SE) sealer. Background data: Various methods are used for smear layer removal in endodontics, such as the application of Er,Cr:YSGG lasers. This laser system may influence the bond strength of resin-based sealers. Methods: Sixty single-rooted extracted teeth were selected. After root canal preparation, samples were divided into two experimental groups and one positive control group (n=20 per group). In group 1, the smear layer was removed by irrigation with ethylenediaminetetraacetic acid (EDTA) and sodium hypochlorite (NaOCl). In group 2, the smear layer was removed using a 2.78 μm Er,Cr:YSGG laser with radial firing tips (RFT3) (parameters: 1.5W, 140 μs, 20 Hz, and 15% water to 15% air ratio), moving at 2 mm/sec in an apico-coronal direction. Group 3 served as a positive control group. Five specimens from each group were selected for scanning electron microscope (SEM) observation. The remaining 45 roots were obturated with RealSeal SE/Resilon and subjected to push-out tests. Data were analyzed using one way analysis of variance (ANOVA) and Tamhane's test. Results: The results showed no significant difference between push-out bond strength of root canal fillings in the EDTA+NaOCl group and the 1.5W laser group (p>0.05). The positive control group showed the lowest push-out bond strength. Conclusions: The results of the present study indicate that the application of an Er,Cr:YSGG laser with radial firing tips did not adversely affect the push-out bond strength of RealSeal SE sealer to dentin. PMID:24206400

  11. Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source

    SciTech Connect

    Barkusky, Frank; Peth, Christian; Bayer, Armin; Mann, Klaus

    2007-06-15

    In order to perform material interaction studies with intense extreme ultraviolet (EUV) radiation, a Schwarzschild mirror objective coated with Mo/Si multilayers was adapted to a compact laser-based EUV plasma source (pulse energy 3 mJ at {lambda}=13.5 nm, plasma diameter {approx}300 {mu}m). By 10x demagnified imaging of the plasma a pulse energy density of {approx}75 mJ/cm{sup 2} at a pulse length of 6 ns can be achieved in the image plane of the objective. As demonstrated for poly(methyl methacrylate) (PMMA), photoetching of polymer surfaces is possible at this EUV fluence level. This paper presents first results, including a systematic determination of PMMA etching rates under EUV irradiation. Furthermore, the contribution of out-of-band radiation to the surface etching of PMMA was investigated by conducting a diffraction experiment for spectral discrimination from higher wavelength radiation. Imaging of a pinhole positioned behind the plasma accomplished the generation of an EUV spot of 1 {mu}m diameter, which was employed for direct writing of surface structures in PMMA.

  12. Examination of femtosecond laser matter interaction in multipulse regime for surface nanopatterning of vitreous substrates.

    PubMed

    Varkentina, Nadezda; Cardinal, Thierry; Moroté, Fabien; Mounaix, Patrick; André, Pascal; Deshayes, Yannick; Canioni, Lionel

    2013-12-02

    The paper presents our results on laser micro- and nanostructuring of sodium aluminosilicate glass for the permanent storage purposes and photonics applications. Surface structuring is realized by fs laser irradiation followed by the subsequent etching in a potassium hydroxide (10M@80 °C) for 1 to 10 minutes. As the energy deposited is lower than the damage and/or ablation threshold, the chemical etching permits to produce small craters in the laser modified region. The laser parameters dependent interaction regimes are revealed by microscopic analysis (SEM and AFM). The influence of etching time on craters formation is investigated under different incident energies, number of pulses and polarization states.

  13. High yield fabrication of low threshold single-mode GaAs/AlGaAs semiconductor ring lasers using metallic etch masks.

    PubMed

    Dutta, Neilanjan; Murakowski, Janusz A; Shi, Shouyuan; Prather, Dennis W

    2010-05-24

    We demonstrate a novel high yield fabrication process for single-mode ridge-waveguide GaAs/AlGaAs ring lasers with significantly lower threshold currents than previously reported for similar devices. In this fabrication process, the ridge waveguide structure is patterned using a metallic etch mask, which survives ensuing fabrication steps to form a continuous metallic cover over the entire resonator structure. This metallic cover improves the uniformity of electrical contact between the resonator structure and the metallic biasing layer deposited at the conclusion of the fabrication process. This leads to optimum electrical pumping of the fabricated devices. This fabrication process also allows for the passivation of the ridge-waveguide device sidewalls and separation of the metallic biasing layer from the optical mode.

  14. 2-μm single longitudinal mode GaSb-based laterally coupled distributed feedback laser with regrowth-free shallow-etched gratings by interference lithography

    NASA Astrophysics Data System (ADS)

    Cheng-Ao, Yang; Yu, Zhang; Yong-Ping, Liao; Jun-Liang, Xing; Si-Hang, Wei; Li-Chun, Zhang; Ying-Qiang, Xu; Hai-Qiao, Ni; Zhi-Chuan, Niu

    2016-02-01

    We report a type-I GaSb-based laterally coupled distributed-feedback (LC-DFB) laser with shallow-etched gratings operating a continuous wave at room temperature without re-growth process. Second-order Bragg gratings are fabricated alongside the ridge waveguide by interference lithography. Index-coupled LC-DFB laser with a cavity of 1500 μm achieves single longitudinal mode continuous-wave operation at 20 °C with side mode suppression ratio (SMSR) as high as 24 dB. The maximum single mode continuous-wave output power is about 10 mW at room temperature (uncoated facet). A low threshold current density of 230 A/cm2 is achieved with differential quantum efficiency estimated to be 93 mW/A. The laser shows a good wavelength stability against drive current and working temperature. Project supported by the National Key Basic Research Program of China (Grant Nos. 2014CB643903 and 2013CB932904), the National Special Funds for the Development of Major Research Equipment and Instruments, China (Grant No. 2012YQ140005), the National Natural Science Foundation of China (Grant Nos. 61435012, 61274013, 61306088, and 61290303), and the Strategic Priority Research Program (B) of the Chinese Academy of Sciences (Grant No. XDB01010200).

  15. Widely tunable (PbSn)Te lasers using etched cavities for mass production. [for infrared spectroscopic applications

    NASA Technical Reports Server (NTRS)

    Miller, M. D.

    1980-01-01

    Lead salt diode lasers are being used increasingly as tunable sources of monochromatic infrared radiation in a variety of spectroscopic systems. These devices are particularly useful, both in the laboratory and in the field, because of their high spectral brightness (compared to thermal sources) and wide spectral coverage (compared to line-tunable gas lasers). While the primary commercial application of these lasers has been for ultrahigh resolution laboratory spectroscopy, there are numerous systems applications, including laser absorbtion pollution monitors and laser heterodyne radiometers, for which diode lasers have great potential utility. Problem areas related to the wider use of these components are identified. Among these are total tuning range, mode control, and high fabrication cost. A fabrication technique which specifically addresses the problems of tuning range and cost, and which also has potential application for mode control, is reported.

  16. Nonlinear optical absorption in laser modified regions of fused silica substrates

    SciTech Connect

    Walser, A D; Demos, S; Etienne, M; Dorsinville, R

    2004-03-23

    The presence of strong nonlinear absorption has been observed in laser modified fused silica. Intensity-dependent transmission measurements using 355-nm, 532-nm and 1,064-nm laser pulses were performed in pristine polished regions in fused silica substrates and in locations that were exposed to dielectric breakdown. The experimental results suggest that multi-photon absorption is considerably stronger in the modified regions compared to pristine sites and is strongly dependent on the excitation wavelength.

  17. Preliminary Study of Polymer Removal in 0.25, 0.3, and 0.5 μm Ruthenium Storage Nodes and 0.11 μm, 10.9:1 High-Aspect-Ratio Trenches by Laser-Induced Etching

    NASA Astrophysics Data System (ADS)

    Kim, Yong-Gi; Cha, Byung Heon

    2005-07-01

    The demands for new etching technology are increasing because of new materials, such as, ruthenium (Ru), platinum (Pt), and iridium (Ir), that are now being used, and the strict critical dimension (C/D) controls required in today’s ultra large scale integrated (ULSI) circuit technology and dynamic random-access memory (DRAM) fabrication lines. Laser etching technology successfully etched organometallic polymers generated after reactive ion etching and ash processing in 0.25, 0.3, and 0.5 μm Ru storage nodes. In this study, the effects of the incident beam profile on the laser-induced etching of the polymers are investigated. Unevenness of the peak energy in the Gaussian beam profile creates unequal etching and heating effects on the polymer removal depending on the irradiating position of the line beam profile on the sample surface. This article discusses for the first time the preliminary results of laser-induced etching with a KrF laser to remove photoresist (PR) and polymer in 0.11 μm deep contact holes with a high-aspect-ratio 10.9:1 trench hole. How deep can the laser etching technology penetrate and strip the PR at a high aspect ratio (A/R) of 10.9:1 and a 0.11 μm hole size? The penetration depth for the PR removal was approximately 1 μm, which is about a 9.1:1 A/R in a 0.11 μm hole with a 1.2-μm-deep trench. Several promising points are discussed on the basis of laser etching in such a high A/R and small 0.11 μm contact hole. Laser-induced etching technology enabled a very uniform penetration depth without any fluctuations, and it also did not show any attack on the edge of the barrier material TiN.

  18. Etching Integrated Circuits

    NASA Technical Reports Server (NTRS)

    Kennedy, B. W.

    1983-01-01

    20-page report reviews methods available for etching specific layers on wafers and discusses automation techniques and features on one particular automated system. Compares two major etching methods, chemical (wet) and plasma (dry), and discusses areas in need of development. Methods covered include "dip-and-dunk" manual method of chemical etching, automated chemical etching, and plasma etching.

  19. Combination of a self-etching adhesive and a resin-modified glass ionomer: effect of water and saliva contamination on bond strength to dentin.

    PubMed

    Dursun, Elisabeth; Attal, Jean-Pierre

    2011-10-01

    Because studies have shown that adherence to dentin of resin-modified glass ionomers (RMGI) can be improved by surface treatment with a self-etching adhesive (SEA), the purpose of this in vitro study was to evaluate the water and saliva tolerance of this combination before and after application of SEA. Seventy cylinders of an RMGI (Fuji II LC) were bonded to the dentin of human teeth: 10 without any surface treatment, 10 after polyalkenoic acid conditioning, 10 after application of SEA, 10 after application of SEA on water contaminated dentin, 10 after application of SEA on saliva contaminated dentin, 10 on water contaminated light-cured SEA, and 10 on saliva contaminated light-cured SEA. The shear bond strength (SBS) was determined in a universal testing machine and the site of bond failure recorded. A Kruskal-Wallis test was performed followed by Games-Howell post-hoc pairwise comparison tests on the SBS results (p < 0.05), and a chi-square test was used for the fractographic analysis (p < 0.05). The lowest SBS was obtained without conditioning (5 ± 1 MPa). Polyalkenoic acid improved SBS (8 ± 2 MPa) and SEA increased it very significantly (15 ± 2 MPa), even in the case of water contamination (16 ± 2 MPa before application of SEA, 21 ± 4 MPa after application of SEA), or saliva contamination (20 ± 7 MPa before application of SEA, 19 ± 6 MPa after application of SEA). The group bonded without conditioning resulted in only adhesive fractures, showing a statistically significant difference from the other groups. SEA in association with the Fuji II LC RMGI increased the SBS very significantly, even in the case of water or saliva contamination.

  20. An investigation of phase transformation and crystallinity in laser surface modified H13 steel

    NASA Astrophysics Data System (ADS)

    Aqida, S. N.; Brabazon, D.; Naher, S.

    2013-03-01

    This paper presents a laser surface modification process of AISI H13 tool steel using 0.09, 0.2 and 0.4 mm size of laser spot with an aim to increase hardness properties. A Rofin DC-015 diffusion-cooled CO2 slab laser was used to process AISI H13 tool steel samples. Samples of 10 mm diameter were sectioned to 100 mm length in order to process a predefined circumferential area. The parameters selected for examination were laser peak power, overlap percentage and pulse repetition frequency (PRF). X-ray diffraction analysis (XRD) was conducted to measure crystallinity of the laser-modified surface. X-ray diffraction patterns of the samples were recorded using a Bruker D8 XRD system with Cu K α ( λ=1.5405 Å) radiation. The diffraction patterns were recorded in the 2 θ range of 20 to 80°. The hardness properties were tested at 981 mN force. The laser-modified surface exhibited reduced crystallinity compared to the un-processed samples. The presence of martensitic phase was detected in the samples processed using 0.4 mm spot size. Though there was reduced crystallinity, a high hardness was measured in the laser-modified surface. Hardness was increased more than 2.5 times compared to the as-received samples. These findings reveal the phase source of the hardening mechanism and grain composition in the laser-modified surface.

  1. Lateral electrochemical etching of III-nitride materials for microfabrication

    DOEpatents

    Han, Jung

    2017-02-28

    Conductivity-selective lateral etching of III-nitride materials is described. Methods and structures for making vertical cavity surface emitting lasers with distributed Bragg reflectors via electrochemical etching are described. Layer-selective, lateral electrochemical etching of multi-layer stacks is employed to form semiconductor/air DBR structures adjacent active multiple quantum well regions of the lasers. The electrochemical etching techniques are suitable for high-volume production of lasers and other III-nitride devices, such as lasers, HEMT transistors, power transistors, MEMs structures, and LEDs.

  2. Excimer laser ablation of thick SiOx-films: Etch rate measurements and simulation of the ablation threshold

    NASA Astrophysics Data System (ADS)

    Ihlemann, J.; Meinertz, J.; Danev, G.

    2012-08-01

    Excimer laser ablation of 4.5 μm thick SiOx-films with x ≈ 1 is investigated at 193 nm, 248 nm, and 308 nm. Strong absorption enables precisely tunable removal depths. The ablation rates correlate with laser penetration depths calculated from low level absorption coefficients. The experimental ablation thresholds are in agreement with numerical simulations on the basis of linear absorption and one-dimensional heat flow. This behaviour is similar to that of strongly UV-absorbing polymers, leading to well controllable micro machining prospects. After laser processing, SiOx can be converted to SiO2, opening a route to laser based fabrication of micro optical components.

  3. Characteristics of the Fiber Laser Sensor System Based on Etched-Bragg Grating Sensing Probe for Determination of the Low Nitrate Concentration in Water

    PubMed Central

    Pham, Thanh Binh; Bui, Huy; Le, Huu Thang; Pham, Van Hoi

    2016-01-01

    The necessity of environmental protection has stimulated the development of many kinds of methods allowing the determination of different pollutants in the natural environment, including methods for determining nitrate in source water. In this paper, the characteristics of an etched fiber Bragg grating (e-FBG) sensing probe—which integrated in fiber laser structure—are studied by numerical simulation and experiment. The proposed sensor is demonstrated for determination of the low nitrate concentration in a water environment. Experimental results show that this sensor could determine nitrate in water samples at a low concentration range of 0–80 ppm with good repeatability, rapid response, and average sensitivity of 3.5 × 10−3 nm/ppm with the detection limit of 3 ppm. The e-FBG sensing probe integrated in fiber laser demonstrates many advantages, such as a high resolution for wavelength shift identification, high optical signal-to-noise ratio (OSNR of 40 dB), narrow bandwidth of 0.02 nm that enhanced accuracy and precision of wavelength peak measurement, and capability for optical remote sensing. The obtained results suggested that the proposed e-FBG sensor has a large potential for the determination of low nitrate concentrations in water in outdoor field work. PMID:28025512

  4. Nanoporous GaN-Ag composite materials prepared by metal-assisted electroless etching for direct laser desorption-ionization mass spectrometry.

    PubMed

    Nie, Bei; Duan, Barrett K; Bohn, Paul W

    2013-07-10

    Three-dimensional nanoporous gallium nitride(PGaN) produced by metal-assisted electroless etching is chemically embedded with silver nanoparticles via electroless deposition, forming a metallized semiconductor membrane with large surface area and nanoscale metal features. A new application utilizing the unique chemical and morphological features of these composite nanostructures is described here, laser induced desorption-ionization(LDI) of biomolecules(e.g., cholesterol and nucleotides) for direct mass analysis, without use of additional organic matrix. Although PGaN itself is a poor matrix for direct LDI mass spectrometry, the combination of Ag and PGaN greatly improves ion signals relative to PGaN or Ag nanostructure surfaces alone. This behavior is attributed to the combination of strong UV absorption, enhanced surface area, and favorable thermal properties of PGaN. Importantly, Ag-PGaN is shown to facilitate the formation of Ag adduct ions in some cases, for example adenine, where adducts are not observed from either porous anodic aluminum membranes or surfaces presenting Ag nanoparticles in isolation. Nanopore-embedded Ag nanostructures serve a dual role: as cationization agents and to assist thermal desorption under UV laser irradiation. The results reported here suggest that the combination of Ag nanostructures embedded in PGaN has the capacity for high quality matrix-free LDI mass analysis.

  5. Characteristics of the Fiber Laser Sensor System Based on Etched-Bragg Grating Sensing Probe for Determination of the Low Nitrate Concentration in Water.

    PubMed

    Pham, Thanh Binh; Bui, Huy; Le, Huu Thang; Pham, Van Hoi

    2016-12-22

    The necessity of environmental protection has stimulated the development of many kinds of methods allowing the determination of different pollutants in the natural environment, including methods for determining nitrate in source water. In this paper, the characteristics of an etched fiber Bragg grating (e-FBG) sensing probe-which integrated in fiber laser structure-are studied by numerical simulation and experiment. The proposed sensor is demonstrated for determination of the low nitrate concentration in a water environment. Experimental results show that this sensor could determine nitrate in water samples at a low concentration range of 0-80 ppm with good repeatability, rapid response, and average sensitivity of 3.5 × 10(-3) nm/ppm with the detection limit of 3 ppm. The e-FBG sensing probe integrated in fiber laser demonstrates many advantages, such as a high resolution for wavelength shift identification, high optical signal-to-noise ratio (OSNR of 40 dB), narrow bandwidth of 0.02 nm that enhanced accuracy and precision of wavelength peak measurement, and capability for optical remote sensing. The obtained results suggested that the proposed e-FBG sensor has a large potential for the determination of low nitrate concentrations in water in outdoor field work.

  6. Etching of glass microchips with supercritical water.

    PubMed

    Karásek, Pavel; Grym, Jakub; Roth, Michal; Planeta, Josef; Foret, František

    2015-01-07

    A novel method of etching channels in glass microchips with the most tunable solvent, water, was tested as an alternative to common hydrogen fluoride-containing etchants. The etching properties of water strongly depend on temperature and pressure, especially in the vicinity of the water critical point. The chips were etched at the subcritical, supercritical and critical temperature of water, and the resulting channel shape, width, depth and surface morphology were studied by scanning electron microscopy and 3D laser profilometry. Channels etched with the hot water were compared with the chips etched with standard hydrogen fluoride-containing solution. Depending on the water pressure and temperature, the silicate dissolved from the glass could be re-deposited on the channel surface. This interesting phenomenon is described together with the conditions necessary for its utilization. The results illustrate the versatility of pure water as a glass etching and surface morphing agent.

  7. Correlation between surface chemistry and ion energy dependence of the etch yield in multicomponent oxides etching

    SciTech Connect

    Berube, P.-M.; Poirier, J.-S.; Margot, J.; Stafford, L.; Ndione, P. F.; Chaker, M.; Morandotti, R.

    2009-09-15

    The influence of surface chemistry in plasma etching of multicomponent oxides was investigated through measurements of the ion energy dependence of the etch yield. Using pulsed-laser-deposited Ca{sub x}Ba{sub (1-x)}Nb{sub 2}O{sub 6} (CBN) and SrTiO{sub 3} thin films as examples, it was found that the etching energy threshold shifts toward values larger or smaller than the sputtering threshold depending on whether or not ion-assisted chemical etching is the dominant etching pathway and whether surface chemistry is enhancing or inhibiting desorption of the film atoms. In the case of CBN films etched in an inductively coupled Cl{sub 2} plasma, it is found that the chlorine uptake is inhibiting the etching reaction, with the desorption of nonvolatile NbCl{sub 2} and BaCl{sub 2} compounds being the rate-limiting step.

  8. Dry etching method for compound semiconductors

    SciTech Connect

    Shul, Randy J.; Constantine, Christopher

    1997-01-01

    A dry etching method. According to the present invention, a gaseous plasma comprising, at least in part, boron trichloride, methane, and hydrogen may be used for dry etching of a compound semiconductor material containing layers including aluminum, or indium, or both. Material layers of a compound semiconductor alloy such as AlGaInP or the like may be anisotropically etched for forming electronic devices including field-effect transistors and heterojunction bipolar transistors and for forming photonic devices including vertical-cavity surface-emitting lasers, edge-emitting lasers, and reflectance modulators.

  9. Dry etching method for compound semiconductors

    DOEpatents

    Shul, R.J.; Constantine, C.

    1997-04-29

    A dry etching method is disclosed. According to the present invention, a gaseous plasma comprising, at least in part, boron trichloride, methane, and hydrogen may be used for dry etching of a compound semiconductor material containing layers including aluminum, or indium, or both. Material layers of a compound semiconductor alloy such as AlGaInP or the like may be anisotropically etched for forming electronic devices including field-effect transistors and heterojunction bipolar transistors and for forming photonic devices including vertical-cavity surface-emitting lasers, edge-emitting lasers, and reflectance modulators. 1 fig.

  10. Laser-modified nanostructures of PET films and cell behavior.

    PubMed

    Mirzadeh, Hamid; Moghadam, Ehsan Vahedi; Mivehchi, Houri

    2011-07-01

    The surface of polyethylene terephthalate (PET) films was irradiated using KrF excimer laser (λ = 248 nm) with different number of pulses at constant repetition rate. The adhesion behavior of L-929 fibroblast cells on the irradiated surface was investigated. The changes in films' morphology were characterized by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The hydrophilicity and both polar and dispersion components of the surface tension of the treated films were evaluated by contact angle and surface tension measurement techniques. The films roughness was evaluated by atomic force microscopy. AFM and SEM observations showed that a specific nanostructure was created on the laser-treated polyethylene terephthalate surface. Contact angle and surface energy measurements have indicated an increase in wettability of the laser treated samples up to 5 pulses as optimum result; while, by increasing the laser pulses beyond 5 pulses the hydrophilicity of laser treated samples dropped and the surface energy of the treated films was leveled off. Data from in vitro assays showed significant cell attachment and cell growth onto laser treated samples in comparison with the untreated films. Moreover, a number of fibroblast cells attached and proliferated onto treated PET films were achieved under optimum condition of 5 pulses which was significantly higher than the other treated samples.

  11. Designing a Broadband Pump for High-Quality Micro-Lasers via Modified Net Radiation Method.

    PubMed

    Nechayev, Sergey; Reusswig, Philip D; Baldo, Marc A; Rotschild, Carmel

    2016-12-07

    High-quality micro-lasers are key ingredients in non-linear optics, communication, sensing and low-threshold solar-pumped lasers. However, such micro-lasers exhibit negligible absorption of free-space broadband pump light. Recently, this limitation was lifted by cascade energy transfer, in which the absorption and quality factor are modulated with wavelength, enabling non-resonant pumping of high-quality micro-lasers and solar-pumped laser to operate at record low solar concentration. Here, we present a generic theoretical framework for modeling the absorption, emission and energy transfer of incoherent radiation between cascade sensitizer and laser gain media. Our model is based on linear equations of the modified net radiation method and is therefore robust, fast converging and has low complexity. We apply this formalism to compute the optimal parameters of low-threshold solar-pumped lasers. It is revealed that the interplay between the absorption and self-absorption of such lasers defines the optimal pump absorption below the maximal value, which is in contrast to conventional lasers for which full pump absorption is desired. Numerical results are compared to experimental data on a sensitized Nd(3+):YAG cavity, and quantitative agreement with theoretical models is found. Our work modularizes the gain and sensitizing components and paves the way for the optimal design of broadband-pumped high-quality micro-lasers and efficient solar-pumped lasers.

  12. Designing a Broadband Pump for High-Quality Micro-Lasers via Modified Net Radiation Method

    PubMed Central

    Nechayev, Sergey; Reusswig, Philip D.; Baldo, Marc A.; Rotschild, Carmel

    2016-01-01

    High-quality micro-lasers are key ingredients in non-linear optics, communication, sensing and low-threshold solar-pumped lasers. However, such micro-lasers exhibit negligible absorption of free-space broadband pump light. Recently, this limitation was lifted by cascade energy transfer, in which the absorption and quality factor are modulated with wavelength, enabling non-resonant pumping of high-quality micro-lasers and solar-pumped laser to operate at record low solar concentration. Here, we present a generic theoretical framework for modeling the absorption, emission and energy transfer of incoherent radiation between cascade sensitizer and laser gain media. Our model is based on linear equations of the modified net radiation method and is therefore robust, fast converging and has low complexity. We apply this formalism to compute the optimal parameters of low-threshold solar-pumped lasers. It is revealed that the interplay between the absorption and self-absorption of such lasers defines the optimal pump absorption below the maximal value, which is in contrast to conventional lasers for which full pump absorption is desired. Numerical results are compared to experimental data on a sensitized Nd3+:YAG cavity, and quantitative agreement with theoretical models is found. Our work modularizes the gain and sensitizing components and paves the way for the optimal design of broadband-pumped high-quality micro-lasers and efficient solar-pumped lasers. PMID:27924844

  13. Designing a Broadband Pump for High-Quality Micro-Lasers via Modified Net Radiation Method

    NASA Astrophysics Data System (ADS)

    Nechayev, Sergey; Reusswig, Philip D.; Baldo, Marc A.; Rotschild, Carmel

    2016-12-01

    High-quality micro-lasers are key ingredients in non-linear optics, communication, sensing and low-threshold solar-pumped lasers. However, such micro-lasers exhibit negligible absorption of free-space broadband pump light. Recently, this limitation was lifted by cascade energy transfer, in which the absorption and quality factor are modulated with wavelength, enabling non-resonant pumping of high-quality micro-lasers and solar-pumped laser to operate at record low solar concentration. Here, we present a generic theoretical framework for modeling the absorption, emission and energy transfer of incoherent radiation between cascade sensitizer and laser gain media. Our model is based on linear equations of the modified net radiation method and is therefore robust, fast converging and has low complexity. We apply this formalism to compute the optimal parameters of low-threshold solar-pumped lasers. It is revealed that the interplay between the absorption and self-absorption of such lasers defines the optimal pump absorption below the maximal value, which is in contrast to conventional lasers for which full pump absorption is desired. Numerical results are compared to experimental data on a sensitized Nd3+:YAG cavity, and quantitative agreement with theoretical models is found. Our work modularizes the gain and sensitizing components and paves the way for the optimal design of broadband-pumped high-quality micro-lasers and efficient solar-pumped lasers.

  14. Modified trocar with laser diode for instrument guidance.

    PubMed

    Rajab, Taufiek Konrad

    2013-12-01

    Laparoscopic instruments that are newly inserted into trocars are initially outside the surgeon's endoscopic field of view. This can make it difficult to accurately position the instrument at the operative site and presents a potential risk to patients since the tip of the instrument could potentially perforate organs and blood vessels while it is advanced blindly. To solve this problem, I have designed a trocar that incorporates a laser pointer to guide laparoscopic instruments while they are outside the endoscopic field of view. The laser dot is projected along the long axis of the trocar. This allows the surgeon to instantly determine the direction and target of the introduced instrument. Furthermore, the projected laser dot serves as evidence of an unobstructed path from the trocar to the target. This modification improves safety in laparoscopic surgery.

  15. Metal etching composition

    NASA Technical Reports Server (NTRS)

    Otousa, Joseph E. (Inventor); Thomas, Clark S. (Inventor); Foster, Robert E. (Inventor)

    1991-01-01

    The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent. The etching composition is particularly useful for etching metal surfaces in preparation for subsequent fluorescent penetrant inspection.

  16. Using femtosecond lasers to modify sizes of gold nanoparticles

    NASA Astrophysics Data System (ADS)

    da Silva Cordeiro, Thiago; Almeida de Matos, Ricardo; Silva, Flávia Rodrigues de Oliveira; Vieira, Nilson D.; Courrol, Lilia C.; Samad, Ricardo E.

    2016-04-01

    Metallic nanoparticles are important on several scientific, medical and industrial areas. The control of nanoparticles characteristics has fundamental importance to increase the efficiency on the processes and applications in which they are employed. The metallic nanoparticles present specific surface plasmon resonances (SPR). These resonances are related with the collective oscillations of the electrons presents on the metallic nanoparticle. The SPR is determined by the potential defined by the nanoparticle size and geometry. There are several methods of producing gold nanoparticles, including the use of toxic chemical polymers. We already reported the use of natural polymers, as for example, the agar-agar, to produce metallic nanoparticles under xenon lamp irradiation. This technique is characterized as a "green" synthesis because the natural polymers are inoffensive to the environment. We report a technique to produce metallic nanoparticles and change its geometrical and dimensional characteristics using a femtosecond laser. The 1 ml initial solution was irradiate using a laser beam with 380 mW, 1 kHz and 40 nm of bandwidth centered at 800 nm. The setup uses an Acousto-optic modulator, Dazzler, to change the pulses spectral profiles by introduction of several orders of phase, resulting in different temporal energy distributions. The use of Dazzler has the objective of change the gold nanoparticles average size by the changing of temporal energy distributions of the laser pulses incident in the sample. After the laser irradiation, the gold nanoparticles average diameter were less than 15 nm.

  17. Laser welding and post weld treatment of modified 9Cr-1MoVNb steel.

    SciTech Connect

    Xu, Z.

    2012-04-03

    Laser welding and post weld laser treatment of modified 9Cr-1MoVNb steels (Grade P91) were performed in this preliminary study to investigate the feasibility of using laser welding process as a potential alternative to arc welding methods for solving the Type IV cracking problem in P91 steel welds. The mechanical and metallurgical testing of the pulsed Nd:YAG laser-welded samples shows the following conclusions: (1) both bead-on-plate and circumferential butt welds made by a pulsed Nd:YAG laser show good welds that are free of microcracks and porosity. The narrow heat affected zone has a homogeneous grain structure without conventional soft hardness zone where the Type IV cracking occurs in conventional arc welds. (2) The laser weld tests also show that the same laser welder has the potential to be used as a multi-function tool for weld surface remelting, glazing or post weld tempering to reduce the weld surface defects and to increase the cracking resistance and toughness of the welds. (3) The Vicker hardness of laser welds in the weld and heat affected zone was 420-500 HV with peak hardness in the HAZ compared to 240 HV of base metal. Post weld laser treatment was able to slightly reduce the peak hardness and smooth the hardness profile, but failed to bring the hardness down to below 300 HV due to insufficient time at temperature and too fast cooling rate after the time. Though optimal hardness of weld made by laser is to be determined for best weld strength, methods to achieve the post weld laser treatment temperature, time at the temperature and slow cooling rate need to be developed. (4) Mechanical testing of the laser weld and post weld laser treated samples need to be performed to evaluate the effects of laser post treatments such as surface remelting, glazing, re-hardening, or tempering on the strength of the welds.

  18. Dry etching of metallization

    NASA Technical Reports Server (NTRS)

    Bollinger, D.

    1983-01-01

    The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in which samples are directly exposed to an electrical discharge, and ion beam processes in which samples are etched by a beam of ions extracted from a discharge. The plasma etch processes can be distinguished by the degree to which ion bombardment contributes to the etch process. This, in turn is related to capability for anisotropic etching. Reactive Ion Etching (RIE) and Ion Beam Etching are of most interest for etching of thin film metals. RIE is generally considered the best process for large volume, anisotropic aluminum etching.

  19. Evaluation of modifying the bonding protocol of a new acid-etch primer on the shear bond strength of orthodontic brackets.

    PubMed

    Ajlouni, Raed; Bishara, Samir E; Oonsombat, Charuphan; Denehy, Gerald E

    2004-06-01

    The purpose of the study was to evaluate the shear bond strength of orthodontic brackets when light curing both the self-etch primer and the adhesive in one step. Fourty eight teeth were bonded with self-etch primer Angel I (3M/ESPE, St Paul, Minn) and divided into three groups. In group I (control), 16 teeth were stored in deionized water for 24 hours before debonding. In group II, 16 teeth were debonded within half-an-hour to simulate when the initial archwires were ligated. In group III, 16 additional teeth were bonded using exactly the same procedure as in groups I and II, but the light cure used for 10 seconds after applying the acid-etch primer was eliminated, and the light cure used for 20 seconds after the precoated bracket was placed over the tooth. This saved at least two minutes of the total time of the bonding procedure. The teeth in this group were also debonded within half-an-hour from the time of initial bonding. The teeth debonded after 24 hours of water storage at 37 degrees C had a mean shear bond strength of 6.0 +/- 3.5 MPa, the group that was debonded within half-an-hour of two light exposures had a mean shear bond strength of 5.9 +/- 2.7 MPa, and the mean for the group with only one light cure exposure was 4.3 +/- 2.6 MPa. Light curing the acid-etch primer together with the adhesive after placing the orthodontic bracket did not significantly diminish the shear bond strength as compared with light curing the acid-etch primer and the adhesive separately.

  20. Etched Terrain

    NASA Technical Reports Server (NTRS)

    2003-01-01

    [figure removed for brevity, see original site]

    Released 17 June 2003

    This stunning THEMIS visible image was acquired in 'etched terrain' near the south pole of Mars. In several places in this image there are large areas with many dark spots. These spots have been noticed to appear and disappear as the seasons progress on Mars. As the southern hemisphere of Mars gets warmer, carbon dioxide frost present in this terrain sublimates, leaving behind the dark spots.

    Image information: VIS instrument. Latitude -73.5, Longitude 351.3 East (8.7 West). 19 meter/pixel resolution.

    Note: this THEMIS visual image has not been radiometrically nor geometrically calibrated for this preliminary release. An empirical correction has been performed to remove instrumental effects. A linear shift has been applied in the cross-track and down-track direction to approximate spacecraft and planetary motion. Fully calibrated and geometrically projected images will be released through the Planetary Data System in accordance with Project policies at a later time.

    NASA's Jet Propulsion Laboratory manages the 2001 Mars Odyssey mission for NASA's Office of Space Science, Washington, D.C. The Thermal Emission Imaging System (THEMIS) was developed by Arizona State University, Tempe, in collaboration with Raytheon Santa Barbara Remote Sensing. The THEMIS investigation is led by Dr. Philip Christensen at Arizona State University. Lockheed Martin Astronautics, Denver, is the prime contractor for the Odyssey project, and developed and built the orbiter. Mission operations are conducted jointly from Lockheed Martin and from JPL, a division of the California Institute of Technology in Pasadena.

  1. Photonic jet μ-etching: from static to dynamic process

    NASA Astrophysics Data System (ADS)

    Abdurrochman, A.; Lecler, S.; Zelgowski, J.; Mermet, F.; Fontaine, J.; Tumbelaka, B. Y.

    2017-05-01

    Photonic jet etching is a direct-laser etching method applying photonic jet phenomenon to concentrate the laser beam onto the proceeded material. We call photonic jet the phenomenon of the localized sub-wavelength propagative beam generated at the shadow-side surfaces of micro-scale dielectric cylinders or spheres, when they are illuminated by an electromagnetic plane-wave or laser beam. This concentration has made possible the laser to yield sub-μ etching marks, despite the laser was a near-infrared with nano-second pulses sources. We will present these achievements from the beginning when some spherical glasses were used for static etching to dynamic etching using an optical fiber with a semi-elliptical tip.

  2. Modeling Wet Chemical Etching of Surface Flaws on Fused Silica

    SciTech Connect

    Feit, M D; Suratwala, T I; Wong, L L; Steele, W A; Miller, P E; Bude, J D

    2009-10-28

    Fluoride-based wet chemical etching of fused silica optical components is useful to open up surface fractures for diagnostic purposes, to create surface topology, and as a possible mitigation technique to remove damaged material. To optimize the usefulness of etching , it is important to understand how the morphology of etched features changes as a function of the amount of material removed. In this study, we present two geometric etch models that describe the surface topology evolution as a function of the amount etched. The first model, referred to as the finite-difference etch model, represents the surface as an array of points in space where at each time-step the points move normal to the local surface. The second model, referred to as the surface area-volume model, more globally describes the surface evolution relating the volume of material removed to the exposed surface area. These etch models predict growth and coalescence of surface fractures such as those observed on scratches and ground surfaces. For typical surface fractures, simulations show that the transverse growth of the cracks at long etch times scales with the square root of etch time or the net material removed in agreement with experiment. The finite-difference etch model has also been applied to more complex structures such as the etching of a CO{sub 2} laser-mitigated laser damage site. The results indicate that etching has little effect on the initial morphology of this site implying little change in downstream scatter and modulation characteristics upon exposure to subsequent high fluence laser light. In the second part of the study, the geometric etch model is expanded to include fluid dynamics and mass transport. This later model serves as a foundation for understanding related processes such as the possibility of redeposition of etch reaction products during the etching, rinsing or drying processes.

  3. Wind Etching

    NASA Image and Video Library

    2016-08-09

    Today's VIS image is located in a region that has been heavily modified by wind action. The narrow ridge/valley system seen in this image are a feature called yardangs. Yardangs form when unidirectional winds blow across poorly cemented materials. Multiple yardang directions can indicate changes in regional wind regimes. Orbit Number: 64188 Latitude: -0.629314 Longitude: 206.572 Instrument: VIS Captured: 2016-06-03 01:20 http://photojournal.jpl.nasa.gov/catalog/PIA20799

  4. Thermal Conductivity Based on Modified Laser Flash Measurement

    NASA Technical Reports Server (NTRS)

    Lin, Bochuan; Ban, Heng; Li, Chao; Scripa, Rosalia N.; Su, Ching-Hua; Lehoczky, Sandor L.

    2005-01-01

    The laser flash method is a standard method for thermal diffusivity measurement. It employs single-pulse heating of one side of a thin specimen and measures the temperature response of the other side. The thermal diffusivity of the specimen can be obtained based on a one-dimensional transient heat transfer analysis. This paper reports the development of a theory that includes a transparent reference layer with known thermal property attached to the back of sample. With the inclusion of heat conduction from the sample to the reference layer in the theoretical analysis, the thermal conductivity and thermal diffusivity of sample can be extracted from the temperature response data. Furthermore, a procedure is established to select two points from the data to calculate these properties. The uncertainty analysis indicates that this method can be used with acceptable levels of uncertainty.

  5. On the modified active region design of interband cascade lasers

    SciTech Connect

    Motyka, M.; Ryczko, K.; Dyksik, M.; Sęk, G.; Misiewicz, J.; Weih, R.; Dallner, M.; Kamp, M.; Höfling, S.

    2015-02-28

    Type II InAs/GaInSb quantum wells (QWs) grown on GaSb or InAs substrates and designed to be integrated in the active region of interband cascade lasers (ICLs) emitting in the mid infrared have been investigated. Optical spectroscopy, combined with band structure calculations, has been used to probe their electronic properties. A design with multiple InAs QWs has been compared with the more common double W-shaped QW and it has been demonstrated that it allows red shifting the emission wavelength and enhancing the transition oscillator strength. This can be beneficial for the improvements of the ICLs performances, especially when considering their long-wavelength operation.

  6. Feasibility of atomic layer etching of polymer material based on sequential O{sub 2} exposure and Ar low-pressure plasma-etching

    SciTech Connect

    Vogli, Evelina; Metzler, Dominik; Oehrlein, Gottlieb S.

    2013-06-24

    We describe controlled, self-limited etching of a polystyrene polymer using a composite etching cycle consisting of sequential deposition of a thin reactive layer from precursors produced from a polymer-coated electrode within the etching chamber, modification using O{sub 2} exposure, and subsequent low-pressure Ar plasma etching, which removes the oxygen-modified deposited reactive layer along with Almost-Equal-To 0.1 nm unmodified polymer. Deposition prevents net etching of the unmodified polymer during the etching step and enables self-limited etch rates of 0.1 nm/cycle.

  7. New Etch Monitoring Technique

    NASA Astrophysics Data System (ADS)

    Kaiser, Christina; Adamcyk, Martin; Levy, Yuval; Tiedje, Tom; Young, Jeff F.; Kelson, Itzhak

    2000-05-01

    Plasma etching is an important tool for the development of various types of nanostructures. The development of specific plasma etching procedures is often time-consuming. We will describe an new technique for IN-SITU monitoring of the etch rate and sidewall profile of 1D GRATINGS in a remote plasma etcher. The technique involves monitoring the energy loss of alpha particles that propagate through the layer being etched. Samples to be etched are impregnated by a thin near-surface layer of 224Ra nuclei that decay by alpha particle emission. The energy spectrum of the alpha particles is acquired at intervals in the etch process. The etch rate on flat surfaces can be determined quite simply by measuring the change in the peak energy of the transmitted particles. By using a simple geometric model that employs the Bethe Bloch formula for energy loss of charges particles the etch profile of masked samples can also be inferred.

  8. Solid state dye lasers based on LDS 698 doped in modified polymethyl methacrylate.

    PubMed

    Fan, Rongwei; Xia, Yuanqin; Chen, Deying

    2008-06-23

    Broad band solid state dye lasers based on LDS 698 doped in modified polymethyl methacrylate (MPMMA) with laser wavelength about 650 nm were demonstrated. It was demonstrated that the fluorescence spectra of LDS 698 in solid host MPMMA displays an obvious blue shift about 50 nm comparing with that in ethanol solution. The dye concentration has great effect on the laser's performance including laser slope efficiency and lifetime. The lifetime increased dramatically with the increase of the LDS 698 concentration. With pump repetition rate of 10 Hz and intensity of 0.1 J/cm(2), the maximum lifetime 300,000 shots corresponding normalized photostability 102 GJ/mol was obtained with LDS 698 at 1.5 x 10(-4)mol/L.

  9. Wear rate control of peek surfaces modified by femtosecond laser

    NASA Astrophysics Data System (ADS)

    Hammouti, S.; Pascale-Hamri, A.; Faure, N.; Beaugiraud, B.; Guibert, M.; Mauclair, C.; Benayoun, S.; Valette, S.

    2015-12-01

    This paper presents the effect of laser texturing on the tribological properties of PEEK surfaces under a ball-on-flat contact configuration. Thus, surfaces with circular dimples of various diameters and depth were created. Tests were conducted with a normal load of 5 N and a sliding velocity of 0.01 m s-1, using bovine calf serum at 37.5 °C as a lubricant. The tribological conditions including the sliding frequency and the lubricant viscosity indicate that tests were performed under boundary lubrication regime. Results showed that discs with higher dimple depth exhibited higher friction coefficient and caused more abrasive wear on the ball specimen. Nevertheless, tribosystems (ball and disc) with dimpled disc surfaces showed a higher wear resistance. In the frame of our experiments, wear rates obtained for tribosystems including dimpled surfaces were 10 times lower than tribosystems including limited patterned or untextured surfaces. Applications such as design of spinal implants may be concerned by such a surface treatment to increase wear resistance of components.

  10. Adhesion studies on dental enamel surfaces irradiated by a rapidly scanned carbon dioxide laser

    NASA Astrophysics Data System (ADS)

    Chang, Kwang K.; Staninec, Michal; Chan, Kenneth H.; Fried, Daniel

    2011-03-01

    In this study, we investigated the influence of different laser scanning patterns on the adhesive strength of laser irradiated enamel surfaces both with and without post ablation acid etching. Previous studies of dental enamel surfaces ablated by a rapidly scanned carbon dioxide laser indicated that the highly uniform smooth surfaces produced by the scanned laser beam yielded low bond strength and acid etching was required in order to attain a high bond strength. However, since the enamel surface after ablation by CO2 lasers is more resistant to acid dissolution it is desirable to avoid acid etching before bonding. The overlap between adjacent laser spots was varied to modify the effective surface roughness. In addition, small retention holes were drilled at higher laser intensity with varying spacing to increase the adhesive strength without acid etching. Varying the degree of overlap between adjacent laser spots did not significantly influence the bond strength with post ablation acid etching. The bond strength was significantly higher without acid etching with retention holes spaced 250-μm apart.

  11. Adhesion studies on dental enamel surfaces irradiated by a rapidly scanned carbon dioxide laser.

    PubMed

    Chang, Kwang K; Staninec, Michal; Chan, Kenneth H; Fried, Daniel

    2011-01-01

    In this study, we investigated the influence of different laser scanning patterns on the adhesive strength of laser irradiated enamel surfaces both with and without post ablation acid etching. Previous studies of dental enamel surfaces ablated by a rapidly scanned carbon dioxide laser indicated that the highly uniform smooth surfaces produced by the scanned laser beam yielded low bond strength and acid etching was required in order to attain a high bond strength. However, since the enamel surface after ablation by CO(2) lasers is more resistant to acid dissolution it is desirable to avoid acid etching before bonding. The overlap between adjacent laser spots was varied to modify the effective surface roughness. In addition, small retention holes were drilled at higher laser intensity with varying spacing to increase the adhesive strength without acid etching. Varying the degree of overlap between adjacent laser spots did not significantly influence the bond strength with post ablation acid etching. The bond strength was significantly higher without acid etching with retention holes spaced 250-µm apart.

  12. Raman study of TiO2 coatings modified by UV pulsed laser

    NASA Astrophysics Data System (ADS)

    Belka, Radosław; Keczkowska, Justyna; Sek, Piotr

    2016-12-01

    The TiO2 coatings were prepared by simple sol-gel method and modified by UV pulsed laser. TiO2, also know as titania, is a ceramic compound, existing in numerous polymorphic forms, mainly as tetragonal rutile and anatase, and rhomboidal brookite. Rutile is the most stable form of titanium dioxide, whereas anatase is a metastable form, created in lower temperatures than rutile. Anatase is marked with higher specific surface area, porosity and a higher number of surface hydroxyl groups as compared to rutile. The unique optical and electronic properties of TiO2 results in its use as semiconductors dielectric mirrors, sunscreen and UV-blocking pigments and especially as photocatalyst. In this paper, the tetraisopropoxide was used as Ti precursor according to sol-gel method. An organic base was applied during sol preparation. Prepared gel was coated on glass substrates and calcined in low temperature to obtain amorphous phase of titania. Prepared coatings were modified by UV picosecond pulse laser with different pulse repetition rate and pulse power. Physical modification of the coatings using laser pulses was intended in order change the phase content of the produced material. Raman spectroscopy (RS) method was applied to studies of modified coatings as it is one of the basic analytical techniques, supporting the identification of compounds and obtaining information about the structure. Especially, RS is a useful method for distinguishing the anatase and rutile phases. In these studies, anatase to rutile transformation was observed, depending on laser parameters.

  13. Alkaline etch system qualification

    SciTech Connect

    Goldammer, S.E.; Pemberton, S.E.; Tucker, D.R.

    1997-04-01

    Based on the data from this qualification activity, the Atotech etch system, even with minimum characterization, was capable of etching production printed circuit products as good as those from the Chemcut system. Further characterization of the Atotech system will improve its etching capability. In addition to the improved etch quality expected from further characterization, the Atotech etch system has additional features that help reduce waste and provide for better consistency in the etching process. The programmable logic controller and computer will allow operators to operate the system manually or from pre-established recipes. The evidence and capabilities of the Atotech system made it as good as or better than the Chemcut system for etching WR products. The Printed Wiring Board Engineering Department recommended that the Atotech system be released for production. In December 1995, the Atotech system was formerly qualified for production.

  14. Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells

    PubMed Central

    Hüpkes, Jürgen; Owen, Jorj I; Pust, Sascha E; Bunte, Eerke

    2012-01-01

    Abstract Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided. PMID:22162035

  15. Chemical etching of zinc oxide for thin-film silicon solar cells.

    PubMed

    Hüpkes, Jürgen; Owen, Jorj I; Pust, Sascha E; Bunte, Eerke

    2012-01-16

    Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.

  16. Single beam determination of porosity and etch rate in situ during etching of porous silicon

    NASA Astrophysics Data System (ADS)

    Foss, S. E.; Kan, P. Y. Y.; Finstad, T. G.

    2005-06-01

    A laser reflection method has been developed and tested for analyzing the etching of porous silicon (PS) films. It allows in situ measurement and analysis of the time dependency of the etch rate, the thickness, the average porosity, the porosity profile, and the interface roughness. The interaction of an infrared laser beam with a layered system consisting of a PS layer and a substrate during etching results in interferences in the reflected beam which is analyzed by the short-time Fourier transform. This method is used for analysis of samples prepared with etching solutions containing different concentrations of HF and glycerol and at different current densities and temperatures. Variations in the etch rate and porosity during etching are observed, which are important effects to account for when optical elements in PS are made. The method enables feedback control of the etching so that PS films with a well-controlled porosity are obtainable. By using different beam diameters it is possible to probe interface roughness at different length scales. Obtained porosity, thickness, and roughness values are in agreement with values measured with standard methods.

  17. Surface engineering of SiC via sublimation etching

    NASA Astrophysics Data System (ADS)

    Jokubavicius, Valdas; Yazdi, Gholam R.; Ivanov, Ivan G.; Niu, Yuran; Zakharov, Alexei; Iakimov, Tihomir; Syväjärvi, Mikael; Yakimova, Rositsa

    2016-12-01

    We present a technique for etching of SiC which is based on sublimation and can be used to modify the morphology and reconstruction of silicon carbide surface for subsequent epitaxial growth of various materials, for example graphene. The sublimation etching of 6H-, 4H- and 3C-SiC was explored in vacuum (10-5 mbar) and Ar (700 mbar) ambient using two different etching arrangements which can be considered as Si-C and Si-C-Ta chemical systems exhibiting different vapor phase stoichiometry at a given temperature. The surfaces of different polytypes etched under similar conditions are compared and the etching mechanism is discussed with an emphasis on the role of tantalum as a carbon getter. To demonstrate applicability of such etching process graphene nanoribbons were grown on a 4H-SiC surface that was pre-patterned using the thermal etching technique presented in this study.

  18. Preparation of platinum modified titanium dioxide nanoparticles with the use of laser ablation in water.

    PubMed

    Siuzdak, K; Sawczak, M; Klein, M; Nowaczyk, G; Jurga, S; Cenian, A

    2014-08-07

    We report on the preparation method of nanocrystalline titanium dioxide modified with platinum by using nanosecond laser ablation in liquid (LAL). Titania in the form of anatase crystals has been prepared in a two-stage process. Initially, irradiation by laser beam of a titanium metal plate fixed in a glass container filled with deionized water was conducted. After that, the ablation process was continued, with the use of a platinum target placed in a freshly obtained titania colloid. In this work, characterization of the obtained nanoparticles, based on spectroscopic techniques--Raman, X-ray photoelectron and UV-vis reflectance spectroscopy--is given. High resolution transmission electron microscopy was used to describe particle morphology. On the basis of photocatalytic studies we observed the rate of degradation process of methylene blue (MB) (a model organic pollution) in the presence of Pt modified titania in comparison to pure TiO2--as a reference case. Physical and chemical mechanisms of the formation of platinum modified titania are also discussed here. Stable colloidal suspensions containing Pt modified titanium dioxide crystalline anatase particles show an almost perfect spherical shape with diameters ranging from 5 to 30 nm. The TiO2 nanoparticles decorated with platinum exhibit much higher (up to 30%) photocatalytic activity towards the degradation of MB under UV illumination than pure titania.

  19. In vitro mesenchymal stem cell response to a CO2 laser modified polymeric material.

    PubMed

    Waugh, D G; Hussain, I; Lawrence, J; Smith, G C; Cosgrove, D; Toccaceli, C

    2016-10-01

    With an ageing world population it is becoming significantly apparent that there is a need to produce implants and platforms to manipulate stem cell growth on a pharmaceutical scale. This is needed to meet the socio-economic demands of many countries worldwide. This paper details one of the first ever studies in to the manipulation of stem cell growth on CO2 laser surface treated nylon 6,6 highlighting its potential as an inexpensive platform to manipulate stem cell growth on a pharmaceutical scale. Through CO2 laser surface treatment discrete changes to the surfaces were made. That is, the surface roughness of the nylon 6,6 was increased by up to 4.3μm, the contact angle was modulated by up to 5° and the surface oxygen content increased by up to 1atom %. Following mesenchymal stem cell growth on the laser treated samples, it was identified that CO2 laser surface treatment gave rise to an enhanced response with an increase in viable cell count of up to 60,000cells/ml when compared to the as-received sample. The effect of surface parameters modified by the CO2 laser surface treatment on the mesenchymal stem cell response is also discussed along with potential trends that could be identified to govern the mesenchymal stem cell response.

  20. Etch By-Products in Plasma Etching

    NASA Astrophysics Data System (ADS)

    Radtke, Matthew T.; Coburn, J. W.; Graves, David B.

    2002-10-01

    Etch byproducts commonly play a major role in plasma composition, influencing etch rate, anisotropy, critical dimension control, and selectivity. Environmental implications associated with the etching process and subsequent chamber cleans are also a concern for new materials. In this work, experimental diagnostics were used to study silicon etch byproduct chemistry in Cl_2/O2 plasmas as a model case. We report studies using an inductively coupled plasma reactor equipped with a cooled, rf-biased chuck, a downstream FTIR spectrometer, a quartz crystal microbalance, a Langmuir probe, an ion flux wall probe, an ion mass spectrometer, a separate threshold ionization mass spectrometer for neutral radical detection, and an optical emission spectrometer . Neutral mass spectrometer measurements in pure SiCl4 were used to measure the SiCl4 electron impact direct ionization cross section and dissociative ionization thresholds for SiCl_x^+ ions. Ion and neutral mass spectrometry were used to measure plasma composition in order to demonstrate the relative importance of etch byproducts. Specie wall fluxes were then calculated and compared with in-situ wall deposition and ex-situ XPS measurements to study the wall deposition mechanism.

  1. MR-Guided Laser-Induced Thermotherapy of the Infratemporal Fossa and Orbit in Malignant Chondrosarcoma via a Modified Technique

    SciTech Connect

    Vogl, Thomas J.; Mack, Martin G.; Straub, Ralf; Eichler, Katrin; Zangos, Stephan

    2001-12-15

    A 76-year-old patient presented with a recurrent mass of a malignant chondrosarcoma in the right infratemporal fossa and in the left maxillary sinus with orbital invasion. The patient was treated with a palliative intention with MR-guided laser-induced thermotherapy using a modified applicator technique. Following treatment clinical symptoms improved and MRI revealed complete laser-induced tumor necrosis.

  2. Alternative process for thin layer etching: Application to nitride spacer etching stopping on silicon germanium

    SciTech Connect

    Posseme, N. Pollet, O.; Barnola, S.

    2014-08-04

    Silicon nitride spacer etching realization is considered today as one of the most challenging of the etch process for the new devices realization. For this step, the atomic etch precision to stop on silicon or silicon germanium with a perfect anisotropy (no foot formation) is required. The situation is that none of the current plasma technologies can meet all these requirements. To overcome these issues and meet the highly complex requirements imposed by device fabrication processes, we recently proposed an alternative etching process to the current plasma etch chemistries. This process is based on thin film modification by light ions implantation followed by a selective removal of the modified layer with respect to the non-modified material. In this Letter, we demonstrate the benefit of this alternative etch method in term of film damage control (silicon germanium recess obtained is less than 6 A), anisotropy (no foot formation), and its compatibility with other integration steps like epitaxial. The etch mechanisms of this approach are also addressed.

  3. Thermal Property Measurement of Semiconductor Melt using Modified Laser Flash Method

    NASA Technical Reports Server (NTRS)

    Lin, Bochuan; Zhu, Shen; Ban, Heng; Li, Chao; Scripa, Rosalla N.; Su, Ching-Hua; Lehoczky, Sandor L.

    2003-01-01

    This study further developed standard laser flash method to measure multiple thermal properties of semiconductor melts. The modified method can determine thermal diffusivity, thermal conductivity, and specific heat capacity of the melt simultaneously. The transient heat transfer process in the melt and its quartz container was numerically studied in detail. A fitting procedure based on numerical simulation results and the least root-mean-square error fitting to the experimental data was used to extract the values of specific heat capacity, thermal conductivity and thermal diffusivity. This modified method is a step forward from the standard laser flash method, which is usually used to measure thermal diffusivity of solids. The result for tellurium (Te) at 873 K: specific heat capacity 300.2 Joules per kilogram K, thermal conductivity 3.50 Watts per meter K, thermal diffusivity 2.04 x 10(exp -6) square meters per second, are within the range reported in literature. The uncertainty analysis showed the quantitative effect of sample geometry, transient temperature measured, and the energy of the laser pulse.

  4. A new generation of self-etching adhesives: comparison with traditional acid etch technique.

    PubMed

    Holzmeier, Marcus; Schaubmayr, Martin; Dasch, Walter; Hirschfelder, Ursula

    2008-03-01

    The aim of this study was to determine the shear bond strength (SBS), etching pattern and depth, and debonding performance of several market-leading, self-etching (SE) adhesives primarily used in restorative dentistry (iBond, Clearfil S(3) Bond, Clearfil Protect Bond, AdheSE, XenoIII), two experimental self-etching adhesives (exp. Bond 1, exp. Bond 2) and one experimental self-etching cement (SE Zement) used with and without prior phosphoric acid-etching, and to compare them to an orthodontic self-etching product (Transbond Plus SE Primer) and to traditional acid-etch technique (Transbond XT Primer, phosphoric acid) All adhesives were applied on pumiced and embedded bovine incisors following the manufacturers' instructions. Then one bracket each (coated with Transbond XT composite) was bonded (n = 20). Transbond XT was polymerized for 20 s from the incisal and gingival sides using a halogen device positioned at a constant 5 mm from and a 45 degrees angle to the specimen. The specimens were stored in distilled water for 24 h at 37 degrees C before measuring SBS. The ARI (adhesive remnant index) for all specimens was determined from the sheared-off brackets of each. After conditioning, the surface texture was morphologically evaluated from scanning electron microscope (SEM) images, while the etching depth was determined using a confocal laser-scanning microscope (CLSM). All groups were tested for normal distribution and analyzed by applying ANOVA, Kruskal-Wallis or the t test. In addition, a Bonferroni correction was used. The median values of the SBS tests were: SE Zement 3.0 MPa, SE Zement preceded by phosphoric acid etching 11.2 MPa, experimental bond 1: 7.4 MPa, experimental bond 2: 5.6 MPa, iBond 8.1 MPa, Clearfil S(3) Bond 14.1 MPa, Clearfil Protect Bond 16.6 MPa, Clearfil SE Bond 15.9 MPa, AdheSE 16.0 MPa, XenoIII 16.1 MPa, Transbond SE Primer 20.7 MPa, acid-etching+Transbond XT Primer 21.0 MPa. With the exception of iBond, we observed no significant

  5. Modified Laser Flash Method for Thermal Properties Measurements and the Influence of Heat Convection

    NASA Technical Reports Server (NTRS)

    Lin, Bochuan; Zhu, Shen; Ban, Heng; Li, Chao; Scripa, Rosalia N.; Su, Ching-Hua; Lehoczky, Sandor L.

    2003-01-01

    The study examined the effect of natural convection in applying the modified laser flash method to measure thermal properties of semiconductor melts. Common laser flash method uses a laser pulse to heat one side of a thin circular sample and measures the temperature response of the other side. Thermal diffusivity can be calculations based on a heat conduction analysis. For semiconductor melt, the sample is contained in a specially designed quartz cell with optical windows on both sides. When laser heats the vertical melt surface, the resulting natural convection can introduce errors in calculation based on heat conduction model alone. The effect of natural convection was studied by CFD simulations with experimental verification by temperature measurement. The CFD results indicated that natural convection would decrease the time needed for the rear side to reach its peak temperature, and also decrease the peak temperature slightly in our experimental configuration. Using the experimental data, the calculation using only heat conduction model resulted in a thermal diffusivity value is about 7.7% lower than that from the model with natural convection. Specific heat capacity was about the same, and the difference is within 1.6%, regardless of heat transfer models.

  6. Laser spot tracking based on modified circular Hough transform and motion pattern analysis.

    PubMed

    Krstinić, Damir; Skelin, Ana Kuzmanić; Milatić, Ivan

    2014-10-27

    Laser pointers are one of the most widely used interactive and pointing devices in different human-computer interaction systems. Existing approaches to vision-based laser spot tracking are designed for controlled indoor environments with the main assumption that the laser spot is very bright, if not the brightest, spot in images. In this work, we are interested in developing a method for an outdoor, open-space environment, which could be implemented on embedded devices with limited computational resources. Under these circumstances, none of the assumptions of existing methods for laser spot tracking can be applied, yet a novel and fast method with robust performance is required. Throughout the paper, we will propose and evaluate an efficient method based on modified circular Hough transform and Lucas-Kanade motion analysis. Encouraging results on a representative dataset demonstrate the potential of our method in an uncontrolled outdoor environment, while achieving maximal accuracy indoors. Our dataset and ground truth data are made publicly available for further development.

  7. Laser Spot Tracking Based on Modified Circular Hough Transform and Motion Pattern Analysis

    PubMed Central

    Krstinić, Damir; Skelin, Ana Kuzmanić; Milatić, Ivan

    2014-01-01

    Laser pointers are one of the most widely used interactive and pointing devices in different human-computer interaction systems. Existing approaches to vision-based laser spot tracking are designed for controlled indoor environments with the main assumption that the laser spot is very bright, if not the brightest, spot in images. In this work, we are interested in developing a method for an outdoor, open-space environment, which could be implemented on embedded devices with limited computational resources. Under these circumstances, none of the assumptions of existing methods for laser spot tracking can be applied, yet a novel and fast method with robust performance is required. Throughout the paper, we will propose and evaluate an efficient method based on modified circular Hough transform and Lucas–Kanade motion analysis. Encouraging results on a representative dataset demonstrate the potential of our method in an uncontrolled outdoor environment, while achieving maximal accuracy indoors. Our dataset and ground truth data are made publicly available for further development. PMID:25350502

  8. Ablation properties of inorganic filler modified benzoxazine composite coating irradiated by high-intensity continuous laser

    NASA Astrophysics Data System (ADS)

    Xu, Feng; Ma, Zhuang; Li, Hezhang; Gao, Lihong; Wang, Fuchi

    2017-05-01

    Benzoxazine resin with good heat resistance, low combustion heat release and high char yield is a promising thermosetting resin. Meanwhile, research shows that the inorganic filler can effectively improve the thermodynamic property of the resin. It makes that the inorganic filler modified benzoxazine may have a potential application in laser ablation. The benzoxazine coating with and without inorganic filler ammonium polyphosphate, melamine and pentaerythritol (P-BOZ and BOZ) were prepared by brush and thermal curing method. The ablation properties of these coatings irradiated by high-intensity laser were investigated. The scanning electron microscope, Raman spectroscopy and thermal gravimetric analysis were used to characterize the micrographs, carbon layer structure and thermodynamic property of the sample. Results show that the composite coating has excellent thermal protective properties. The back temperature of 20 wt% P-BOZ coating under different parameter laser power (1000W/cm2, 5s; 1000W/cm2, 10s) are 40% lower than these of the BOZ coating and the 20 wt% P-BOZ has higher mass ablation rate. In the surface layer of the irradiated area, dense carbon layer is produced which reduces the absorb of the laser energy of the interior. In the interior of the sample, a large number of closed bell shaped holes are generated which are beneficial to obstruct the heat conduction.

  9. The processes of modified microareas formation in the bulk of porous glasses by laser radiation

    NASA Astrophysics Data System (ADS)

    Kostyuk, G. K.; Sergeev, M. M.; Yakovlev, E. B.

    2015-06-01

    The possibility of the formation of modified microareas (MAs) with changed optical properties in the bulk of porous glasses (PGs) with laser radiation is investigated. A laser module of continuous action with wavelength λ = 800 nm and power P = 120 mW was used as the source of radiation. The material used in the experiment was PG of 94.73 SiO2-4.97 B2O3-0.30 Na2O. A model that describes the processes taking place under laser radiation that lead to a modification of the glass is proposed. Our evaluation results based on experimental data are given. The results of an additional PG plate of the same composition impregnated with glycerol—a substance with a high degree of polarizability—during exposure experiments are also given. A fiber laser of continuous action with wavelength λ = 1070 nm and power P = 16.5 W was used as a source of radiation.

  10. Modified Laser Flash Method for Thermal Properties Measurements and the Influence of Heat Convection

    NASA Technical Reports Server (NTRS)

    Lin, Bochuan; Zhu, Shen; Ban, Heng; Li, Chao; Scripa, Rosalia N.; Su, Ching-Hua; Lehoczky, Sandor L.

    2003-01-01

    The study examined the effect of natural convection in applying the modified laser flash method to measure thermal properties of semiconductor melts. Common laser flash method uses a laser pulse to heat one side of a thin circular sample and measures the temperature response of the other side. Thermal diffusivity can be calculations based on a heat conduction analysis. For semiconductor melt, the sample is contained in a specially designed quartz cell with optical windows on both sides. When laser heats the vertical melt surface, the resulting natural convection can introduce errors in calculation based on heat conduction model alone. The effect of natural convection was studied by CFD simulations with experimental verification by temperature measurement. The CFD results indicated that natural convection would decrease the time needed for the rear side to reach its peak temperature, and also decrease the peak temperature slightly in our experimental configuration. Using the experimental data, the calculation using only heat conduction model resulted in a thermal diffusivity value is about 7.7% lower than that from the model with natural convection. Specific heat capacity was about the same, and the difference is within 1.6%, regardless of heat transfer models.

  11. Microstructures evolution and physical properties of laser induced NbC modified nanocrystalline composites

    NASA Astrophysics Data System (ADS)

    Li, Jianing; Liu, Kegao; Yuan, Xingdong; Shan, Feihu; Zhang, Bolun; Wang, Zhe; Xu, Wenzhuo; Zhang, Zheng; An, Xiangchen

    2017-10-01

    The nanoscale quasicrystals (NQs), amorphous and ultrafine nanocrystals (UNs) modified hard composites are produced by laser cladding (LC) of the Ni60A-TiC-NbC-Sb mixed powders on the additive manufacturing (AM) TA1 titanium alloy. The LC technique is favorable to formations of icosahedral quasicrystals (I-phase) with five-fold symmetry due to its rapid cooling and solidification characteristics. The formation mechanism of this I-phase is explained here. Under the actions of NQs, amorphous and UNs, such LC composites exhibited an extremely high micro-hardness. UNs may also intertwin with amorphous, forming yarn-shape materials. This research provides essential theoretical basis to improve the quality of laser-treated composites.

  12. Pre-etching vs. grinding in promotion of adhesion to intact enamel using self-etch adhesives.

    PubMed

    Nazari, Amir; Shimada, Yasushi; Sadr, Alireza; Tagami, Junji

    2012-01-01

    This study was aimed to determine the effectiveness of grinding and pre-etching in promotion of adhesion to human intact enamel using the self-etch adhesive (SEA) Adper Easy Bond (3M ESPE). Etch-and-rinse adhesive Adper Single Bond (3M ESPE) served as control. Composite cylinders (AP-X Kuraray) were built and after 24 h micro-shear bond strengths (MSBS) were measured. Bonding interfaces were evaluated under scanning electron microscope (SEM). For evaluation of average roughness (Ra) and morphological analysis, treated enamel surfaces were observed under SEM and confocal laser scanning microscope (CLSM) with 3D surface profiling. Highest bond strengths were obtained by pre-etching and grinding showed a less significant role. Phosphoric acid (PA) etching compare to grinding created significantly rougher surface (Ra: 0.72 and 0.43 µm respectively). Therefore, this study recommends pre-etching the intact enamel prior to application of the adhesive instead of grinding.

  13. Laser surface and subsurface modification of sapphire using femtosecond pulses

    NASA Astrophysics Data System (ADS)

    Eberle, G.; Schmidt, M.; Pude, F.; Wegener, K.

    2016-08-01

    Two methods to process sapphire using femtosecond laser pulses are demonstrated, namely ablation (surface), and in-volume laser modification followed by wet etching (subsurface). Firstly, the single and multipulse ablation threshold is determined and compared with previous literature results. A unique application of ablation is demonstrated by modifying the entrance aperture of water jet orifices. Laser ablation exhibits advantages in terms of geometric flexibility and resolution, however, defects in the form of edge outbreaks and poor surface quality are evident. Secondly, the role of material transformation, polarisation state and formation of multi-focus structures after in-volume laser modification is investigated in order to explain their influence during the wet etching process. Laser scanning and electron microscopy as well as electron backscatter diffraction measurements supported by ion beam polishing are used to better understand quality and laser-material interactions of the two demonstrated methods of processing.

  14. Anisotropic etching of silicon in solutions containing tensioactive compounds

    NASA Astrophysics Data System (ADS)

    Zubel, Irena

    2016-12-01

    The results of investigations concerning anisotropic etching in 3M KOH and 25% TMAH solutions modified by tensioactive compounds such as alcohols, diols and a typical surfactant Triton X100 have been compared. Etching anisotropy was assessed on the basis of etch rates ratio V(110)/V(100). It was stated that the relation between surface tension of the solutions and etch rates of particular planes depend not only on the kind of surfactant but also on the kind of etching solution (KOH, TMAH). It points out an important role of TMA+ ions in the etching process, probably in the process of forming an adsorption layer, consisting of the molecules of tensioactive compounds on Si surface, which decides about etch rate. We have observed that this phenomenon occurs only at high concentration of TMA+ ions (25% TMAH). Reduction of TMAH concentration changes the properties of surfactant containing TMAH solutions. From all investigated solutions, the solutions that assured developing of (110) plane inclined at the angle of 45° to (100) substrate were selected. Such planes can be used as micromirrors in MOEMS structures. The solutions provide the etch rate ratio V(110)/V(100)<0.7, thus they were selected from hydroxide solutions containing surfactants. A simple way for etch rate anisotropy V(110)/V(100) assessment based on microscopic images etched structures has been proposed.

  15. Simulation of Plasma Etching

    NASA Astrophysics Data System (ADS)

    Moroz, Paul; Moroz, Daniel

    2016-09-01

    Plasma is an indispensable tool in materials processing. It provides chemically and physically active species and directional flows of energetic species enabling deep etching with good straight profiles required by the industry. At present time, the only feasible methods of simulating the resulting feature profiles are those which fall within the scope of feature-scale (FS) simulation methods, utilizing engineering-type of reactions of incoming species with solid materials. At the same time, the molecule dynamics (MD) methods are emerging as an important alternative approach to simulating extremely small features with sizes below of a few nanometers. In our presentation, we discuss both FS methods implemented into the FPS3D code and MD methods implemented into the MDSS code. We also discuss the ways of extracting information about the reactions and interactions used in FS codes from the MD simulations utilizing the approach of interatomic potentials. For this presentation, we selected two types of simulation cases for etching. The first type considers simulation of mostly etching and implantation, such as during Si etching by chlorine-argon plasma. The second type considers ALE (atomic layer etch) when etching is done by a cyclic process of surface passivation/activation with the following process of etching/removal of a single atomic layer per cycle or per a few cycles, allowing ultimate processing accuracy. The simulations are carried out with both FS and MD codes to provide the data for relation and comparison between those two very different approaches.

  16. Femtosecond laser fabrication of nanostructures in silica glass.

    PubMed

    Taylor, R S; Hnatovsky, C; Simova, E; Rayner, D M; Bhardwaj, V R; Corkum, P B

    2003-06-15

    A femtosecond laser beam focused inside fused silica and other glasses can modify the refractive index of the glass. Chemical etching and atomic-force microscope studies show that the modified region can have a sharp-tipped cone-shaped structure with a tip diameter as small as 100 nm. Placing the structure near the bottom surface of a silica glass sample and applying a selective chemical etch to the bottom surface produces clean, circular, submicrometer-diameter holes. Holes spaced as close to one another as 1.4 microm are demonstrated.

  17. Measurement and analysis of internal loss and injection efficiency for continuous-wave blue semipolar ( 20 2 ¯ 1 ¯ ) III-nitride laser diodes with chemically assisted ion beam etched facets

    NASA Astrophysics Data System (ADS)

    Becerra, Daniel L.; Kuritzky, Leah Y.; Nedy, Joseph; Saud Abbas, Arwa; Pourhashemi, Arash; Farrell, Robert M.; Cohen, Daniel A.; DenBaars, Steven P.; Speck, James S.; Nakamura, Shuji

    2016-02-01

    Continuous-wave blue semipolar ( 20 2 ¯ 1 ¯ ) III-nitride laser diodes were fabricated with highly vertical, smooth, and uniform mirror facets produced by chemically assisted ion beam etching. Uniform mirror facets are a requirement for accurate experimental determination of internal laser parameters, including internal loss and injection efficiency, which were determined to be 9 cm-1 and 73%, respectively, using the cavity length dependent method. The cavity length of the uncoated devices was varied from 900 μm to 1800 μm, with threshold current densities ranging from 3 kA/cm2 to 9 kA/cm2 and threshold voltages ranging from 5.5 V to 7 V. The experimentally determined internal loss was found to be in good agreement with a calculated value of 9.5 cm-1 using a 1D mode solver. The loss in each layer was calculated and in light of the analysis several modifications to the laser design are proposed.

  18. Modified form of laser-induced interstitial thermotherapy (LITT) for the treatment of tumors

    NASA Astrophysics Data System (ADS)

    Chapman, Roxana

    1999-01-01

    LITT has been used for the treatment of benign and malignant tumors since 1983. In all cases the laser fiber/s have been arranged at or near the center of the lesion and the duration of treatment, or fiber tip type, modified in an attempt to destroy the whole tumor. During the last 8 years the author has treated 344 symptomatic patients with more than 1,400 benign uterine leiomyomas by LITT. The first 50 cases were treated traditionally with the fibers directed towards the center of the tumor. Six cases subsequently required second stage LITT and four failed and required hysterectomy. The remaining patients were either treated by directing the laser fibers towards the periphery, where feasible, or throughout the tumor in parallel 3 cm apart. The latter achieved columns of coagulated tissue 5 mm in diameter an strips of healthy tissue between, which subsequently died from tissue anoxia because blood vessels had been coagulated. Research showed that any remaining tissue was deprived of enzymes, hormone receptors and epidermal growth factor and, therefore, did not grow. It is concluded that with malignant tumors cure rather than palliation might be achieved if the laser fibers were directed towards the periphery where the blood vessels enter, and that the surrounding healthy tissue be sacrificed for about 1 cm to destroy micro-invaded tissue and tumor cells within lymphatics.

  19. Treatment of experimental periodontal disease by laser therapy in simvastatin-modified rats

    PubMed Central

    SWERTS, Andressa Araújo; SANTOS, Bianca Fernanda Espósito; BRUZADELLI, Simone Ribeiro; BRIGAGÃO, Maísa Ribeiro Pereira Lima; de LIMA, Daniela Coelho; FERNANDES, Leandro Araújo

    2017-01-01

    Abstract Low intensity laser can be used as a promising alternative in the treatment of periodontal disease. Objective The aim of this study was to evaluate low-level laser therapy (LLLT) as an adjuvant treatment for scaling and root planing (SRP) for the treatment of induced periodontitis in simvastatin-modified rats. Material and Methods A total of 180 rats were evenly divided into two groups: Veh – receiving oral administration of polyethylene glycol (vehicle); S – receiving oral administration of Simvastatin. Periodontal disease was induced in both groups at the first mandibular molar. After seven days, the ligature was removed and the animals were divided into subgroups according to the following local treatments: NT – no treatment; SRP – scaling and root planing and irrigation with saline solution; and LLLT ¬– SRP and laser irradiation (660 nm; 0.03 W; 4 J). Ten animals in each subgroup/local treatment were euthanized at 7, 15 and 30 days. Samples of gingival tissue were processed to analyze the tissue oxidative damage and radiographic analysis. Levels of oxidative stress were analyzed by the expressions of Tripeptideglutathione (TG), Malondialdehyde (MDA) and Carbonylated Proteins (CP). Results The animals in S group had higher levels of TG and lower levels of MDA and CP compared with Veh group (p<0.05). Radiographically, in the intragroup analysis Veh and S, LLLT showed lower bone loss (BL) compared with NT and SRP, in all experimental periods (p<0.01). In addition, a lower BL was observed for the animals of Veh group treated with LLLT compared with treatment SRP in the S group, in all experimental periods. Conclusion Within the limits of this study, we can conclude that LLLT was effective as adjuvant treatment for SRP protecting against the occurrence of oxidative tissue damages as well as for reducing alveolar bone loss in experimentally induced periodontitis simvastatin-modified rats. PMID:28877277

  20. Silicon vertical microstructure fabrication by catalytic etching

    NASA Astrophysics Data System (ADS)

    Huang, Mao-Jung; Yang, Chii-Rong; Chang, Chun-Ming; Chu, Nien-Nan; Shiao, Ming-Hua

    2012-08-01

    This study presents an effective, simple and inexpensive process for forming micro-scale vertical structures on a (1 0 0) silicon wafer. Several modified etchants and micro-patterns including rectangular, snake-like, circular and comb patterns were employed to determine the optimum etching process. We found that an etchant solution consisting of 4.6 M hydrofluoric acid, 0.44 M hydrogen peroxide and isopropyl alcohol produces microstructures at an etching rate of 0.47 µm min-1 and surface roughness of 17.4 nm. All the patterns were transferred faithfully to the silicon substrate.

  1. Efficacy of standard (SLA) and modified sandblasted and acid-etched (SLActive) dental implants in promoting immediate and/or early occlusal loading protocols: a systematic review of prospective studies.

    PubMed

    Chambrone, Leandro; Shibli, Jamil Awad; Mercúrio, Carlos Eduardo; Cardoso, Bruna; Preshaw, Philip M

    2015-04-01

    To assess the survival percentage, clinical and radiographic outcomes of sandblasted and acid-etched (SLA) dental implants and its modified surface (SLActive) in protocols involving immediate and early occlusal loading. MEDLINE, EMBASE and the Cochrane Oral Health Group's Trials Register CENTRAL were searched in duplicate up to, and including, June 2013 to include randomised controlled trials (RCTs) and prospective observational studies of at least 6-month duration published in all languages. Studies limited to patients treated with SLA and/or SLActive implants involving a treatment protocol describing immediate and early loading of these implants were eligible for inclusion. Data on clinical and/or radiographic outcomes following implant placement were considered for inclusion. Of the 447 potentially eligible publications identified by the search strategy, seven RCTs comprising a total of 853 implants (8% titanium plasma-sprayed, 41.5% SLA and 50.5% SLActive) and 12 prospective observational studies including 1394 SLA and 145 SLActive implants were included in this review. According to the Cochrane Collaboration's tool for assessing risk of bias, one of the studies was considered to be at a low risk of bias, whereas the remaining studies were considered to be at an unclear risk. Regarding the observational studies, all of them presented a medium methodological quality based on the Modified Newcastle-Ottawa scale. There were no significant differences reported in the studies in relation to implant loss or clinical parameters between the immediate/early loading and delayed loading protocols. Overall, 95% of SLA and 97% of SLActive implants still survive at the end of follow-up. Despite of the positive findings achieved by the included studies, few RCTs were available for analysis for SLActive implants. Study heterogeneity, scarcity of data and the lack of pooled estimates represent a limitation between studies' comparisons and should be considered when interpreting

  2. Laser Modified ZnO/CdSSe Core-Shell Nanowire Arrays for Micro-Steganography and Improved Photoconduction

    NASA Astrophysics Data System (ADS)

    Lu, Junpeng; Liu, Hongwei; Zheng, Minrui; Zhang, Hongji; Lim, Sharon Xiaodai; Tok, Eng Soon; Sow, Chorng Haur

    2014-09-01

    Arrays of ZnO/CdSSe core/shell nanowires with shells of tunable band gaps represent a class of interesting hybrid nanomaterials with unique optical and photoelectrical properties due to their type II heterojunctions and chemical compositions. In this work, we demonstrate that direct focused laser beam irradiation is able to achieve localized modification of the hybrid structure and chemical composition of the nanowire arrays. As a result, the photoresponsivity of the laser modified hybrid is improved by a factor of ~3. A 3D photodetector with improved performance is demonstrated using laser modified nanowire arrays overlaid with monolayer graphene as the top electrode. Finally, by controlling the power of the scanning focused laser beam, micropatterns with different fluorescence emissions are created on a substrate covered with nanowire arrays. Such a pattern is not apparent when imaged under normal optical microscopy but the pattern becomes readily revealed under fluorescence microscopy i.e. a form of Micro-Steganography is achieved.

  3. Laser modified ZnO/CdSSe core-shell nanowire arrays for Micro-Steganography and improved photoconduction.

    PubMed

    Lu, Junpeng; Liu, Hongwei; Zheng, Minrui; Zhang, Hongji; Lim, Sharon Xiaodai; Tok, Eng Soon; Sow, Chorng Haur

    2014-09-12

    Arrays of ZnO/CdSSe core/shell nanowires with shells of tunable band gaps represent a class of interesting hybrid nanomaterials with unique optical and photoelectrical properties due to their type II heterojunctions and chemical compositions. In this work, we demonstrate that direct focused laser beam irradiation is able to achieve localized modification of the hybrid structure and chemical composition of the nanowire arrays. As a result, the photoresponsivity of the laser modified hybrid is improved by a factor of ~3. A 3D photodetector with improved performance is demonstrated using laser modified nanowire arrays overlaid with monolayer graphene as the top electrode. Finally, by controlling the power of the scanning focused laser beam, micropatterns with different fluorescence emissions are created on a substrate covered with nanowire arrays. Such a pattern is not apparent when imaged under normal optical microscopy but the pattern becomes readily revealed under fluorescence microscopy i.e. a form of Micro-Steganography is achieved.

  4. Interface bonding of NiCrAlY coating on laser modified H13 tool steel surface

    NASA Astrophysics Data System (ADS)

    Reza, M. S.; Aqida, S. N.; Ismail, I.

    2016-06-01

    Bonding strength of thermal spray coatings depends on the interfacial adhesion between bond coat and substrate material. In this paper, NiCrAlY (Ni-164/211 Ni22 %Cr10 %Al1.0 %Y) coatings were developed on laser modified H13 tool steel surface using atmospheric plasma spray (APS). Different laser peak power, P p, and duty cycle, DC, were investigated in order to improve the mechanical properties of H13 tool steel surface. The APS spraying parameters setting for coatings were set constant. The coating microstructure near the interface was analyzed using IM7000 inverted optical microscope. Interface bonding of NiCrAlY was investigated by interfacial indentation test (IIT) method using MMT-X7 Matsuzawa Hardness Tester Machine with Vickers indenter. Diffusion of atoms along NiCrAlY coating, laser modified and substrate layers was investigated by energy-dispersive X-ray spectroscopy (EDXS) using Hitachi Tabletop Microscope TM3030 Plus. Based on IIT method results, average interfacial toughness, K avg, for reference sample was 2.15 MPa m1/2 compared to sample L1 range of K avg from 6.02 to 6.96 MPa m1/2 and sample L2 range of K avg from 2.47 to 3.46 MPa m1/2. Hence, according to K avg, sample L1 has the highest interface bonding and is being laser modified at lower laser peak power, P p, and higher duty cycle, DC, prior to coating. The EDXS analysis indicated the presence of Fe in the NiCrAlY coating layer and increased Ni and Cr composition in the laser modified layer. Atomic diffusion occurred in both coating and laser modified layers involved in Fe, Ni and Cr elements. These findings introduce enhancement of coating system by substrate surface modification to allow atomic diffusion.

  5. The structure and photoconductivity of SiGe/Si epitaxial layers modified by single-pulse laser radiation

    NASA Astrophysics Data System (ADS)

    Ivlev, G. D.; Kazuchits, N. M.; Prakopyeu, S. L.; Rusetsky, M. S.; Gaiduk, P. I.

    2014-12-01

    The effect of nanosecond pulses of ruby laser radiation on the structural state and morphology of the epitaxial layers of a SiO0.5Ge0.5 solid solution on silicon with the initiation of a crystal-melt phase transition has been studied by electron microscopy. Data on the photoelectric parameters of the laser-modified layers having a cellular structure owing to the segregation of germanium during the solidification of the binary melt have been derived.

  6. Antibiofilm activity of sandblasted and laser-modified titanium against microorganisms isolated from peri-implantitis lesions.

    PubMed

    Drago, Lorenzo; Bortolin, Monica; De Vecchi, Elena; Agrappi, Serse; Weinstein, Roberto L; Mattina, Roberto; Francetti, Luca

    2016-10-01

    Infections due to biofilm-producing microorganisms are one of the main causes for the failure of dental implants. Increasing efforts have been made in order to develop new strategies to prevent biofilm formation. In this study, the biofilm development on a newly designed laser-modified titanium implant surface was evaluated and compared to that on conventional sandblasted titanium used in implant dentistry. The amount of biofilm produced by Staphylococcus aureus, Pseudomonas aeruginosa and Porphyromonas gingivalis isolated from peri-implantitis was assessed by a semi-quantitative spectrophotometric method and by confocal laser scanning microscopy. Results showed a lower biofilm production on laser-modified surface compared to the sandblasted one. In particular, a significantly lower total volume of the biomass was observed on laser-modified surface, while no significant changes in live/dead bacteria percentages were noticed between materials. Modifying the topography of the conventional implant surface with laser ablation could represent a promising approach for inhibiting biofilm formation.

  7. Comparison of Modified-ETDRS and Mild Macular Grid Laser Photocoagulation Strategies for Diabetic Macular Edema

    PubMed Central

    2008-01-01

    Purpose To compare two laser photocoagulation techniques for treatment of diabetic macular edema (DME): modified-ETDRS direct/grid photocoagulation (mETDRS) and a, potentially milder, but potentially more extensive, mild macular grid (MMG) laser technique in which small mild burns are placed throughout the macula, whether or not edema is present, and microaneurysms are not treated directly. Methods 263 subjects (mean age 59 years) with previously untreated DME were randomly assigned to receive laser photocoagulation by mETDRS (N=162 eyes) or MMG (N=161 eyes) technique. Visual acuity, fundus photographs and OCT measurements were obtained at baseline and after 3.5, 8, and 12 months. Treatment was repeated if DME persisted. Main Outcome Measure Change in OCT measures at 12-months follow up. Results From baseline to 12 months, among eyes with baseline central subfield thickness ≥ 250 microns, central subfield thickening decreased by an average of 88 microns in the mETDRS group and decreased by 49 microns in the MMG group (adjusted mean difference: 33 microns, 95% confidence interval 5 to 61 microns, P=0.02). Weighted inner zone thickening by OCT decreased by 42 and 28 microns, respectively (adjusted mean difference: 14 microns, 95% confidence interval 1 to 27 microns, P=0.04), maximum retinal thickening (maximum of the central and four inner subfields) decreased by 66 and 39 microns, respectively (adjusted mean difference: 27 microns, 95% confidence interval 6 to 47 microns, P=0.01), and retinal volume decreased by 0.8 and 0.4 mm3, respectively (adjusted mean difference: 0.3 mm3, 95% confidence interval 0.02 to 0.53 mm3, P=0.03). At 12 months, the mean change in visual acuity was 0 letters in the mETDRS group and 2 letters worse in the MMG group (adjusted mean difference: 2 letters, 95% confidence interval −0.5 to 5 letters, P=0.10). Conclusions At 12 months after treatment, the MMG technique is less effective at reducing OCT measured retinal thickening than the

  8. Surface reaction mechanisms in plasma etching processes

    NASA Astrophysics Data System (ADS)

    Zhang, Da

    2000-09-01

    Plasma etching is an essential process in the fabrication of submicron features in the semiconductor industry. Plasma-surface interactions in plasma etching processes are capable of influencing bulk plasma properties as well as determining etch rates and feature profiles. To address the coupling of plasma and surface processes, the Surface Kinetics Model (SKM) was developed and was linked to the Hybrid Plasma Equipment Model (HPEM), a two-dimensional, modularized simulation tool addressing low temperature plasma processing. The SKM accepts reactive fluxes to the surface from the HPEM and generates the surface species coverages and returning fluxes to the plasma by implementing a modified site-balance algorithm. The integration of the SKM and the HPEM provides a self-consistent simulation of plasma chemistry and surface chemistry. The integrated plasma-surface model was used to investigate surface reaction mechanisms in fluorocarbon plasma etching. Fluorocarbon plasmas are widely used for silicon and silicon dioxide etching in microelectronics fabrication due to their high etch rates and good selectivity. One characteristic of fluorocarbon plasma processing is that a polymeric passivation layer is deposited on surfaces during etching. Since the passivation layer limits species diffusion and energy transfer from the plasma to the wafer, the etch rate and selectivity are sensitive to the steady state thickness of the passivation. This polymerization process was investigated. The polymer layer grows by CxFy radical deposition and is consumed by ion sputtering and F atom etching. During SiO2 etching, oxygen atoms in the substrate also etch the polymer. The steady state thickness of the polymer is achieved as a result of a balance between its growth and consumption. The polymerization kinetics relies on the plasma properties, such as ion bombarding energy and the ion-to-neutral flux ratio, which are determined by process conditions. Relationships between process

  9. Wettability characteristics of carbon steel modified with CO 2, Nd:YAG, excimer and high power diode lasers

    NASA Astrophysics Data System (ADS)

    Lawrence, J.; Li, L.

    2000-02-01

    Interaction of CO 2, Nd:YAG, excimer and high power diode laser (HPDL) radiation with the surface of a common mild steel (EN8) was found to effect changes in the wettability characteristics of the steel, namely changes in the measured contact angle. These modifications are related to changes in the surface roughness, changes in the surface oxygen content and changes in the surface energy of the mild steel. The wettability characteristics of the selected mild steel could be controlled and/or modified by laser surface treatment. A correlation between the change of the wetting properties of the mild steel and the laser wavelength was found.

  10. Extreme ultraviolet lithography mask etch study and overview

    NASA Astrophysics Data System (ADS)

    Wu, Banqiu; Kumar, Ajay; Chandrachood, Madhavi; Sabharwal, Amitabh

    2013-04-01

    An overview of extreme ultraviolet lithography (EUVL) mask etch is presented and a EUVL mask etch study was carried out. Today, EUVL implementation has three critical challenges that hinder its adoption: extreme ultraviolet (EUV) source power, resist resolution-line width roughness-sensitivity, and a qualified EUVL mask. The EUVL mask defect challenges result from defects generated during blank preparation, absorber and multilayer deposition processes, as well as patterning, etching and wet clean processes. Stringent control on several performance criteria including critical dimension (CD) uniformity, etch bias, micro-loading, profile control, defect control, and high etch selectivity requirement to capping layer is required during the resist pattern duplication on the underlying absorber layer. EUVL mask absorbers comprise of mainly tantalum-based materials rather than chrome- or MoSi-based materials used in standard optical masks. Compared to the conventional chrome-based absorbers and phase shift materials, tantalum-based absorbers need high ion energy to obtain moderate etch rates. However, high ion energy may lower resist selectivity, and could introduce defects. Current EUVL mask consists of an anti-reflective layer on top of the bulk absorber. Recent studies indicate that a native oxide layer would suffice as an anti-reflective coating layer during the electron beam inspection. The absorber thickness and the material properties are optimized based on optical density targets for the mask as well as electromagnetic field effects and optics requirements of the patterning tools. EUVL mask etch processes are modified according to the structure of the absorber, its material, and thickness. However, etch product volatility is the fundamental requirement. Overlapping lithographic exposure near chip border may require etching through the multilayer, resulting in challenges in profile control and etch selectivity. Optical proximity correction is applied to further

  11. Photoresist 3D profile related etch process simulation and its application to full chip etch compact modeling

    NASA Astrophysics Data System (ADS)

    Wu, Cheng-En; Yang, Wayne; Luan, Lan; Song, Hua

    2015-03-01

    The optical proximity correction (OPC) model and post-OPC verification that takes the developed photoresist (PR) 3D profile into account is needed in the advanced 2Xnm node. The etch process hotspots caused by poor resist profile may not be fully identified during the lithography inspection but will only be observed after the subsequent etch process. A complete mask correction that targets to final etch CD requires not only a lithography R3D profile model but also a etch process compact model. The drawback of existing etch model is to treat the etch CD bias as a function of visibility and pattern density which do not contain the information of resist profile. One important factor to affect the etch CD is the PR lateral erosion during the etch process due to non-vertical PR side wall angle (SWA) and anisotropy of etch plasma source. A simple example is in transferring patterns from PR layer to thin hard mask (HM) layer, which is frequently used in the double pattern (DPT) process. The PR lateral erosion contributes an extra HM etch CD bias which is deviated from PR CD defined by lithography process. This CD bias is found to have a nontrivial dependency on the PR profile and cannot be described by the pattern density or visibility. In this report, we study the etch CD variation to resist SWA under various etch conditions. Physical effects during etch process such as plasma ion reflection and source anisotropy, which modify the local etch rate, are taken into considerations in simulation. The virtual data are generated by Synopsys TCAD tool Sentaurus Topography 3D using Monte Carlo engine. A simple geometry compact model is applied first to explain the behavior of virtual data, however, it works to some extent but lacks accuracy when plasma ion reflection comes into play. A modified version is proposed, for the first time, by including the effects of plasma ion reflection and source anisotropy. The new compact model fits the nonlinear etch CD bias very well for a wide

  12. Confocal scanning laser ophthalmoscopy versus modified conventional fundus camera for fundus autofluorescence.

    PubMed

    Calvo-Maroto, Ana M; Esteve-Taboada, Jose J; Domínguez-Vicent, Alberto; Pérez-Cambrodí, Rafael J; Cerviño, Alejandro

    2016-10-01

    Fundus autofluorescence (FAF) is a noninvasive imaging method to detect fundus endogenous fluorophores, mainly lipofuscin located in the retinal pigment epithelium (RPE). The FAF provides information about lipofuscin distribution and RPE health, and consequently an increased accumulation of lipofuscin has been correlated with ageing and development of certain retinal conditions. Areas covered: An exhaustive literature search in MEDLINE (via OVID) and PUBMED for articles related to ocular FAF in retinal diseases and different devices used for acquiring FAF imaging was conducted. Expert commentary: This review aims to show an overview about autofluorescence in the RPE and the main devices used for acquiring these FAF images. The knowledge of differences in the optical principles, acquisition images and the image post-processing between confocal scanning laser ophthalmoscopy and modified conventional fundus camera will improve the FAF images interpretation when are used as a complementary diagnosis and monitoring tool of retinal diseases.

  13. Treatment of experimental periodontal disease by laser therapy in simvastatin-modified rats.

    PubMed

    Swerts, Andressa Araújo; Santos, Bianca Fernanda Espósito; Bruzadelli, Simone Ribeiro; Brigagão, Maísa Ribeiro Pereira Lima; Lima, Daniela Coelho de; Fernandes, Leandro Araújo

    2017-01-01

    The aim of this study was to evaluate low-level laser therapy (LLLT) as an adjuvant treatment for scaling and root planing (SRP) for the treatment of induced periodontitis in simvastatin-modified rats. A total of 180 rats were evenly divided into two groups: Veh - receiving oral administration of polyethylene glycol (vehicle); S - receiving oral administration of Simvastatin. Periodontal disease was induced in both groups at the first mandibular molar. After seven days, the ligature was removed and the animals were divided into subgroups according to the following local treatments: NT - no treatment; SRP - scaling and root planing and irrigation with saline solution; and LLLT ¬- SRP and laser irradiation (660 nm; 0.03 W; 4 J). Ten animals in each subgroup/local treatment were euthanized at 7, 15 and 30 days. Samples of gingival tissue were processed to analyze the tissue oxidative damage and radiographic analysis. Levels of oxidative stress were analyzed by the expressions of Tripeptideglutathione (TG), Malondialdehyde (MDA) and Carbonylated Proteins (CP). The animals in S group had higher levels of TG and lower levels of MDA and CP compared with Veh group (p<0.05). Radiographically, in the intragroup analysis Veh and S, LLLT showed lower bone loss (BL) compared with NT and SRP, in all experimental periods (p<0.01). In addition, a lower BL was observed for the animals of Veh group treated with LLLT compared with treatment SRP in the S group, in all experimental periods. Within the limits of this study, we can conclude that LLLT was effective as adjuvant treatment for SRP protecting against the occurrence of oxidative tissue damages as well as for reducing alveolar bone loss in experimentally induced periodontitis simvastatin-modified rats.

  14. Microstructure and properties of borocarburized and laser-modified 17CrNi6-6 steel

    NASA Astrophysics Data System (ADS)

    Kulka, M.; Makuch, N.; Pertek, A.; Piasecki, A.

    2012-06-01

    Two-step process: carburizing followed by boriding was applied to the formation of borocarburized layers. The boride layer formed on the substrate of changeable chemical and phase composition (e.g. borocarburized layer) was called "gradient boride layer", in contrast to "typical boride layer", formed on the substrate of constant chemical and phase composition. Until now, the typical heat treatment of borocarburized layer consisted of treatment through hardening: quenching in oil and low-temperature tempering. In this paper, instead of treatment through hardening, laser-heat treatment was employed. The properties of such layer were compared to the properties of typical carburized layer. Three zones characterized the microstructure of laser-modified borocarburized layer: iron borides (FeB+Fe 2B) of modified morphology, hardened carburized zone (heat affected zone) and carburized layer without heat treatment. X-ray microanalysis indicated the increased boron concentration close to the surface due to the occurrence of a mixture of FeB and Fe 2B borides. Near to the hardened carburized zone, Fe 2B phase occurred in the laser-modified boride zone. Laser-heat treated borocarburized layer was characterized by higher microhardness at the surface than that obtained in case of carburized layer. It was caused by the iron borides (FeB+Fe 2B) occurrence at the surface, as a consequence of boriding process. However, the carburized layer was characterized by considerably larger hardened zone. Higher abrasive wear resistance, but lower low-cycle fatigue strength in comparison with the carburized layer, characterized the gradient boride layer formed by borocarburizing and laser surface modification. The indentation craters obtained on the surface of laser-heat treated borocarburized layer revealed sufficient cohesion (HF3 standard). The use of laser-modified borocarburized layers may be advantageous under conditions of high abrasive wear of mating parts. In case of parts, which

  15. Comparison of modified driver circuit and capacitor-transfer circuit in longitudinally excited N2 laser

    NASA Astrophysics Data System (ADS)

    Uno, Kazuyuki; Akitsu, Tetsuya; Nakamura, Kenshi; Jitsuno, Takahisa

    2013-04-01

    We developed a modified driver circuit composed of a capacitance and a spark gap, called a direct-drive circuit, for a longitudinally excited gas laser. The direct-drive circuit uses a large discharge impedance caused by a long discharge length of the longitudinal excitation scheme and eliminates the buffer capacitance used in the traditional capacitor-transfer circuit. We compared the direct-drive circuit and the capacitor-transfer circuit in a longitudinally excited N2 laser (wavelength: 337 nm). Producing high output energy with the capacitor-transfer circuit requires a large storage capacitance and a discharge tube with optimum dimensions (an inner diameter of 4 mm and a length of 10 cm in this work); in contrast, the direct-drive circuit requires a high breakdown voltage, achieved with a small storage capacitance and a large discharge tube. Additionally, for the same input energy of 792 mJ, the maximum output energy of the capacitor-transfer circuit was 174.2 μJ, and that of the direct-drive circuit was 344.7 μJ.

  16. Bioactive coating on titanium implants modified by Nd:YVO4 laser

    NASA Astrophysics Data System (ADS)

    Filho, Edson de Almeida; Fraga, Alexandre F.; Bini, Rafael A.; Guastaldi, Antonio C.

    2011-03-01

    Apatite coating was applied on titanium surfaces modified by Nd:YVO4 laser ablations with different energy densities (fluency) at ambient pressure and atmosphere. The apatites were deposited by biomimetic method using a simulated body fluid solution that simulates the salt concentration of bodily fluids. The titanium surfaces submitted to the fast melting and solidification processes (ablation) were immersed in the simulated body fluid solution for four days. The samples were divided into two groups, one underwent heat treatment at 600 °C and the other dried at 37 °C. For the samples treated thermally the diffractograms showed the formation of a phase mixture, with the presence of the hydroxyapatite, tricalcium phosphate, calcium deficient hydroxyapatite, carbonated hydroxyapatite and octacalcium phosphate phases. For the samples dried only the formation of the octacalcium phosphate and hydroxyapatite phases was verified. The infrared spectra show bands relative to chemical bonds confirmed by the diffraction analyses. The coating of both the samples with and without heat treatment present dense morphology and made up of a clustering of spherical particles ranging from 5 to 20 μm. Based on the results we infer that the modification of implant surfaces employing laser ablations leads to the formation of oxides that help the formation of hydroxyapatite without the need of a heat treatment.

  17. Plasma etching of cavities into diamond anvils for experiments at high pressures and high temperatures

    SciTech Connect

    Weir, S.T.; Cynn, H.; Falabella, S.; Evans, W.J.; Aracne-Ruddle, C.; Farber, D.; Vohra, Y.K.

    2012-10-23

    We describe a method for precisely etching small cavities into the culets of diamond anvils for the purpose of providing thermal insulation for samples in experiments at high pressures and high temperatures. The cavities were fabricated using highly directional oxygen plasma to reactively etch into the diamond surface. The lateral extent of the etch was precisely controlled to micron accuracy by etching the diamond through a lithographically fabricated tungsten mask. The performance of the etched cavities in high-temperature experiments in which the samples were either laser heated or electrically heated is discussed.

  18. Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures

    DOEpatents

    Fischer, Arthur J.; Tsao, Jeffrey Y.; Wierer, Jr., Jonathan J.; Xiao, Xiaoyin; Wang, George T.

    2016-03-01

    Quantum-size-controlled photoelectrochemical (QSC-PEC) etching provides a new route to the precision fabrication of epitaxial semiconductor nanostructures in the sub-10-nm size regime. For example, quantum dots (QDs) can be QSC-PEC-etched from epitaxial InGaN thin films using narrowband laser photoexcitation, and the QD sizes (and hence bandgaps and photoluminescence wavelengths) are determined by the photoexcitation wavelength.

  19. Optical properties of micromachined polysilicon reflective surfaces with etching holes

    NASA Astrophysics Data System (ADS)

    Zou, Jun; Byrne, Colin; Liu, Chang; Brady, David J.

    1998-08-01

    MUMPS (Multi-User MEMS Process) is receiving increasingly wide use in micro optics. We have investigated the optical properties of the polysilicon reflective surface in a typical MUMPS chip within the visible light spectrum. The effect of etching holes on the reflected laser beam is studied. The reflectivity and diffraction patterns at five different wavelengths have been measured. The optical properties of the polysilicon reflective surface are greatly affected by the surface roughness, the etching holes, as well as the material. The etching holes contribute to diffraction and reduction of reflectivity. This study provides a basis for optimal design of micromachined free-space optical systems.

  20. Modified heterodyne efficiency for coherent laser communication in the presence of polarization aberrations.

    PubMed

    Yang, Yufei; Yan, Changxiang; Hu, Chunhui; Wu, Congjun

    2017-04-03

    Heterodyne efficiency is referred as a measure of the quality for the coherent laser communication. The heterodyne efficiency not only reflects the matching of phase and amplitude between the received signal and the local oscillator, but also reveals the polarization matching between the two beams. Different from the common heterodyne efficiency, a revised heterodyne efficiency is proposed by considering the polarization aberrations of optical system. Based on the Polar and Pauli-Zernike decomposition algorithms, the effects of polarization aberrations on the output polarization states are analyzed and shown graphically. The variations of the heterodyne efficiency are investigated by including the separate component of polarization aberrations in mixing of two perfectly matched Gaussian beams. Depending on the modified heterodyne efficiency, an off-axis optical system with a periscopic scanner is modeled and used to discuss the variations of the heterodyne efficiency. A further investigation for three different coatings is accomplished to verify the effects the varied polarization aberrations have on the heterodyne efficiency. The analysis indicates that the modified heterodyne efficiency not only can provide a comprehensive description of the coherent detection system, but also can be used to evaluate and minimize the polarization aberrations of optical system.

  1. Photoelectrochemical etching of InxGa1-xN

    NASA Astrophysics Data System (ADS)

    Hwang, J. M.; Hsieh, J. T.; Ko, C. Y.; Hwang, H. L.; Hung, W. H.

    2000-06-01

    Photoelectrochemical (PEC) etching of InxGa1-xN in the KOH solution under illumination of a Hg-arc lamp is studied. An indium oxide surface layer is formed during PEC etching, which slows down the etching rate. The PEC etch rate of InxGa1-xN is determined by dissolution of indium oxides into the solution. Increase of the solution temperature results in an increase of solubility of indium oxides and thus enhances the PEC etch rate. It is found that stirring the solution can accelerate indium oxides to dissolve into the solution and increase the etch rate. The thick indium oxide layer on the PEC-etched InxGa1-xN surface can be effectively removed by the treatment of using a hot 6N HCl solution. A post-treatment by using a 3.2 M KOH solution can provide a smooth sidewall on the PEC-etched surface for the potential application to laser cavity.

  2. Ion beam sputter etching

    NASA Technical Reports Server (NTRS)

    Banks, Bruce A.; Rutledge, Sharon K.

    1986-01-01

    An ion beam etching process which forms extremely high aspect ratio surface microstructures using thin sputter masks is utilized in the fabrication of integrated circuits. A carbon rich sputter mask together with unmasked portions of a substrate is bombarded with inert gas ions while simultaneous carbon deposition occurs. The arrival of the carbon deposit is adjusted to enable the sputter mask to have a near zero or even slightly positive increase in thickness with time while the unmasked portions have a high net sputter etch rate.

  3. Comparison of silanization/hydrosilation and organosilanization modification procedures on etched capillaries for electrokinetic chromatography.

    PubMed

    Matyska, Maria T; Pesek, Joseph J

    2005-06-24

    Etched capillaries for use in open tubular electrochromatography are modified by silanization/hydrosilation and organosilanization. The migration behavior of both types of capillaries is evaluated with small basic molecules, peptides and proteins. Comparisons of peak symmetry and efficiency are used to measure the effectiveness of the two methods for modifying the etched surface. From this information, the suitability of each method for use with etched capillaries can be determined.

  4. Comparative analysis of root surface smear layer removal by different etching modalities or erbium:yttrium-aluminum-garnet laser irradiation. A scanning electron microscopy study.

    PubMed

    Theodoro, Letícia Helena; Zezell, Denise Maria; Garcia, Valdir Gouveia; Haypek, Patrícia; Nagata, Maria José Hitomi; de Almeida, Juliano Milanezi; de Paula Eduardo, Carlos

    2010-07-01

    The purpose of this study was to evaluate the effect of erbium:yttrium-aluminum-garnet (Er:YAG) laser (2.94 mum) irradiation on the removal of root surface smear layer of extracted human teeth and to compare its efficacy with that of citric acid, ethylenediamine tetra-acetic acid (EDTA), or a gel containing a mixture of tetracycline hydrochloride (HCl) and citric acid, using scanning electron microscopy (SEM). Thirty human dentin specimens were randomly divided into six groups: G1 (control group), irrigated with 10 ml of physiologic saline solution; G2, conditioned with 24% citric acid gel; G3, conditioned with 24% EDTA gel; G4, conditioned with a 50% citric acid and tetracycline gel; G5, irradiated with Er:YAG laser (47 mJ/10 Hz/5.8 J/cm(2)/pulse); G6, irradiated with Er:YAG laser (83 mJ/10 Hz/10.3 J/cm(2)/pulse). Electron micrographs were obtained and analyzed according to a rating system. Statistical analysis was conducted with Kruskal-Wallis and Mann-Whitney tests (P < 0.05). G1 was statistically different from all the other groups; no statistically significant differences were observed between the Er:YAG laser groups and those undergoing the other treatment modalities. When the two Er:YAG laser groups were compared, the fluency of G6 was statistically more effective in smear layer removal than the one used in G5 (Mann-Whitney test, P < 0.01). Root surfaces irradiated by Er:YAG laser had more irregular contours than those treated by chemical agents. It can be concluded that all treatment modalities were effective in smear layer removal. The results of our study suggest that the Er:YAG laser can be safely used to condition diseased root surfaces effectively. Furthermore, the effect of Er:YAG laser irradiation on root surfaces should be evaluated in vivo so that its potential to enhance the healing of periodontal tissues can be assessed.

  5. Anisotropic Ta{sub 2}O{sub 5} waveguide etching using inductively coupled plasma etching

    SciTech Connect

    Muttalib, Muhammad Firdaus A. Chen, Ruiqi Y.; Pearce, Stuart J.; Charlton, Martin D. B.

    2014-07-01

    Smooth and vertical sidewall profiles are required to create low loss rib and ridge waveguides for integrated optical device and solid state laser applications. In this work, inductively coupled plasma (ICP) etching processes are developed to produce high quality low loss tantalum pentoxide (Ta{sub 2}O{sub 5}) waveguides. A mixture of C{sub 4}F{sub 8} and O{sub 2} gas are used in combination with chromium (Cr) hard mask for this purpose. In this paper, the authors make a detailed investigation of the etch process parameter window. Effects of process parameters such as ICP power, platen power, gas flow, and chamber pressure on etch rate and sidewall slope angle are investigated. Chamber pressure is found to be a particularly important factor, which can be used to tune the sidewall slope angle and so prevent undercut.

  6. Chemical downstream etching of tungsten

    SciTech Connect

    Blain, M.G.; Jarecki, R.L.; Simonson, R.J.

    1998-07-01

    The downstream etching of tungsten and tungsten oxide has been investigated. Etching of chemical vapor deposited tungsten and e-beam deposited tungsten oxide samples was performed using atomic fluorine generated by a microwave discharge of argon and NF{sub 3}. Etching was found to be highly activated with activation energies approximated to be 6.0{plus_minus}0.5thinspkcal/mol and 5.4{plus_minus}0.4thinspkcal/mol for W and WO{sub 3}, respectively. In the case of F etching of tungsten, the addition of undischarged nitric oxide (NO) directly into the reaction chamber results in the competing effects of catalytic etch rate enhancement and the formation of a nearly stoichiometric WO{sub 3} passivating tungsten oxide film, which ultimately stops the etching process. For F etching of tungsten oxide, the introduction of downstream NO reduces the etch rate. {copyright} {ital 1998 American Vacuum Society.}

  7. Histological and Histomorphometric Evaluation of Zirconia Dental Implants Modified by Femtosecond Laser versus Titanium Implants: An Experimental Study in Fox Hound Dogs.

    PubMed

    Calvo-Guirado, Jose Luis; Aguilar-Salvatierra, Antonio; Delgado-Ruiz, Rafael Arcesio; Negri, Bruno; Fernández, María Piedad Ramírez; Maté Sánchez de Val, José Eduardo; Gómez-Moreno, Gerardo; Romanos, Georgios E

    2015-06-01

    This study applied femtosecond laser technology to zirconia dental implants (Bredent GmbH & Co.KG, Senden, Germany) to generate a surface texture of microgrooves over the entire intraosseous surface, analyzing its behavior in an in vivo model in comparison with titanium implants with sandblasted and acid-etched surfaces. The study used six American Fox Hound dogs. Each received four implants per hemi-mandible, making a total of eight implants per animal. The 48 immediate loaded implants were divided into two groups of 24 titanium implants (control group) and 24 zirconia implants (study/test group), distributed randomly. Bone-to-implant contact (BIC) values and crestal resorption were determined at 1 and 3 months, also measuring calcium, phosphorous, and carbon concentrations by means of energy dispersive x-ray. BIC percentages after 30 days were 51.36% for titanium implants and 44.68% for zirconia implants. After 90 days, values increased to 61.73% in titanium and 47.94% in zirconia implants. After 30 days, there was more crestal bone lost in the titanium group (0.77 mm) compared with the zirconia group (0.01 mm). After 90 days, zirconia implants showed greater marginal bone resorption (1.25 mm) compared with the titanium group (0.37 mm). The present study shows that zirconia implants with modified surfaces can produce good osseointegration values when compared with titanium implants in terms of BIC and crestal bone resorption at 1 and 3 months. © 2013 Wiley Periodicals, Inc.

  8. A Comparative Study of Microleakage on Dental Surfaces Bonded with Three Self-Etch Adhesive Systems Treated with the Er:YAG Laser and Bur

    PubMed Central

    Sanhadji El Haddar, Youssef; Cetik, Sibel; Bahrami, Babak; Atash, Ramin

    2016-01-01

    Aim. This study sought to compare the microleakage of three adhesive systems in the context of Erbium-YAG laser and diamond bur cavity procedures. Cavities were restored with composite resin. Materials and Methods. Standardized Class V cavities were performed in 72 extracted human teeth by means of diamond burs or Er-YAG laser. The samples were randomly divided into six groups of 12, testing three adhesive systems (Clearfil s3 Bond Plus, Xeno® Select, and Futurabond U) for each method used. Cavities were restored with composite resin before thermocycling (methylene blue 2%, 24 h). The slices were prepared using a microtome. Optical microscope photography was employed to measure the penetration. Results. No statistically significant differences in microleakage were found in the use of bur or laser, nor between adhesive systems. Only statistically significant values were observed comparing enamel with cervical walls (p < 0.001). Conclusion. It can be concluded that the Er:YAG laser is as efficient as diamond bur concerning microleakage values in adhesive restoration procedures, thus constituting an alternative tool for tooth preparation. PMID:27419128

  9. Very deep fused silica etching

    NASA Astrophysics Data System (ADS)

    Steingoetter, Ingo; Grosse, Axel; Fouckhardt, Henning

    2003-01-01

    Fabrication processes for wet chemical and dry etching of hollow capillary leaky optical waveguides in high-purity fused silica for extended path cells for improved optical detection in analytical chemistry are described. We focus on microstructures with etch depths on the order of 80 μm. Special attention is paid to the preparation of the etch masks for the two different etch technologies. The fused silica wet chemical etching technique uses buffered hydrofluoric acid with ultrasonic agitation achieving etch rates > 100 nm/min. We succeeded in developing an etch process based on a single-layer photoresist (AZ 5214E, Clariant Corp.) soft mask, which gives excellent results due to special adhesion promotion and a photoresist hardening cycle after the developing step. This procedure allows for the production of channels of nearly semi-cylindrical profiles with etch depths of up to 87 μm. For the dry etch process a ~10 μm thick Ni layer is used as a hard mask realized with electroplating and a thick photoresist. The etch process is performed in an ECR (Electron Cyclotron Resonance) chamber using CF4 gas. The resulting etch rate for fused silica is about 138 nm/min. Etch depths of (accidentally also) 87 μm are achieved.

  10. Etching fission tracks in zircons.

    PubMed

    Naeser, C W

    1969-07-25

    A new technique has been developed whereby fission tracks can be etched in zircon with a solution of sodiuim hydroxide at 220 degrees C. Etching time varied between 15 minutes and 5 houtrs. Colored zircon required less etching time than the colorless varieties.

  11. Anti-tumor response induced by immunologically modified carbon nanotubes and laser irradiation using rat mammary tumor model

    NASA Astrophysics Data System (ADS)

    Acquaviva, Joseph T.; Hasanjee, Aamr M.; Bahavar, Cody F.; Zhou, Fefian; Liu, Hong; Howard, Eric W.; Bullen, Liz C.; Silvy, Ricardo P.; Chen, Wei R.

    2015-03-01

    Laser immunotherapy (LIT) is being developed as a treatment modality for metastatic cancer which can destroy primary tumors and induce effective systemic anti-tumor responses by using a targeted treatment approach in conjunction with the use of a novel immunoadjuvant, glycated chitosan (GC). In this study, Non-invasive Laser Immunotherapy (NLIT) was used as the primary treatment mode. We incorporated single-walled carbon nanotubes (SWNTs) into the treatment regimen to boost the tumor-killing effect of LIT. SWNTs and GC were conjugated to create a completely novel, immunologically modified carbon nanotube (SWNT-GC). To determine the efficacy of different laser irradiation durations, 5 minutes or 10 minutes, a series of experiments were performed. Rats were inoculated with DMBA-4 cancer cells, a highly aggressive metastatic cancer cell line. Half of the treatment group of rats receiving laser irradiation for 10 minutes survived without primary or metastatic tumors. The treatment group of rats receiving laser irradiation for 5 minutes had no survivors. Thus, Laser+SWNT-GC treatment with 10 minutes of laser irradiation proved to be effective at reducing tumor size and inducing long-term anti-tumor immunity.

  12. Laser micromachining of chemically altered polymers

    SciTech Connect

    Lippert, T.

    1998-08-01

    During the last decade laser processing of polymers has become an important field of applied and fundamental research. One of the most promising proposals, to use laser ablation as dry etching technique in photolithography, has not yet become an industrial application. Many disadvantages of laser ablation, compared to conventional photolithography, are the result of the use of standard polymers. These polymers are designed for totally different applications, but are compared to the highly specialized photoresist. A new approach to laser polymer ablation will be described; the development of polymers, specially designed for high resolution laser ablation. These polymers have photolabile groups in the polymer backbone, which decompose upon laser irradiation or standard polymers are modified for ablation at a specific irradiation wavelength. The absorption maximum can be tailored for specific laser emissino lines, e.g. 351, 308 and 248 nm lines of excimer lasers. The authors show that with this approach many problems associated with the application of laser ablation for photolithography can be solved. The mechanism of ablation for these photopolymers is photochemical, whereas for most of the standard polymers this mechanism is photothermal. The photochemical decomposition mechanism results in high resolution ablation with no thermal damage at the edges of the etched structures. In addition there are no redeposited ablation products or surface modifications of the polymer after ablation.

  13. Bonding performance of universal adhesives in different etching modes.

    PubMed

    Wagner, Andrea; Wendler, Michael; Petschelt, Anselm; Belli, Renan; Lohbauer, Ulrich

    2014-07-01

    The aim of this study was to compare the microtensile bond strength (μTBS) and resin penetration into dentine of three universal adhesives (UAs) applied in two different etching modes (i.e. self-etch or etch-and-rinse). The effect of thermocycling on the μTBS was also evaluated. The occlusal third of sound human molars was removed and the exposed surfaces were treated with three UAs (Futurabond Universal, Scotchbond Universal Adhesive and All-Bond Universal) in self-etch or etch-and-rinse mode. Two one-step self-etch adhesives (Futurabond DC and Futurabond M) were applied on additional teeth as reference. After composite build up, the specimens were stored for 24 h in distilled water at 37 °C or thermocycled for 5000 cycles. Composite/dentine beams were prepared (1 mm(2)) and μTBS test was performed. Data was analyzed using three-way ANOVA and Tukey's test (α=0.05). One additional tooth was prepared for each group for evaluation of infiltration ability into dentine by dyeing the adhesives with a fluorochrome (Rhodamine B). After longitudinal sectioning, the generated interfaces were examined under confocal laser scanning microscopy. The addition of an etching step did not significantly affect the μTBS of none of the UAs, when compared to their self-etch application mode. All pre-etched specimens showed considerably longer resin tags and thicker hybrid layers. Thermocycling had no significant effect on the μTBS of the UAs. Application of an etching step prior to UAs improves their dentine penetration, but does not affect their bond strength to dentine after 24h or after thermocycling for 5000 cycles. Similar bond strength values were observed for the UAs regardless of application mode, which makes them reliable for working under different clinical conditions. Copyright © 2014 Elsevier Ltd. All rights reserved.

  14. Digital Photonic Production of Micro Structures in Glass by In-Volume Selective Laser-Induced Etching using a High Speed Micro Scanner

    NASA Astrophysics Data System (ADS)

    Gottmann, Jens; Hermans, Martin; Ortmann, Jürgen

    Digital photonic production of 3D microfluidic devices and assembled micro mechanics inside fused silica glass is carried out using ISLE directly from digital CAD data. To exploit the potential productivity of new high average power fs-lasers >150 W a modular high speed scanning system has been developed. Acousto-optical beam deflection, galvo-scanners and translation stages are controlled by CAM software. Using a lens with 10 mm focal length a focus radius of 1 μm is scanned with a velocity of 12 m/s on 400 μm track radius enabling the up-scaling of the ISLE- process using fs-laser radiation with up to 30 W.

  15. Examination of thermal properties and degradation of InGaN - based diode lasers by thermoreflectance spectroscopy and focused ion beam etching

    NASA Astrophysics Data System (ADS)

    Pierścińska, Dorota; Pierściński, Kamil; Płuska, Mariusz; Marona, Łucja; Wiśniewski, Przemysław; Perlin, Piotr; Bugajski, Maciej

    2017-07-01

    In this paper, thermal properties of InGaN-based diode lasers are investigated. The thermoreflectance technique was employed to study temperature distributions on the front facet of device. Measurements were performed, allowing investigation of the contribution of two main heat sources to the total temperature rise observed on the facet of device. It has been found that the contribution from reabsorption of laser emission at the facet, is much smaller than the one caused by Joule heating (electrical power). Additionally, devices have been investigated by means of SEM and FIB to determine the degradation sources. Inspection of the devices confirmed the lack of mirror damage or deposits. The main source of degradation was found to be located in the region of ridge and caused by extended defects. Our findings confirm the hypothesis that injected current is the major driving force of degradation.

  16. Optical data recording by laser pulses in liquid-crystal cells with an azo-modified surface

    SciTech Connect

    Serak, S V; Agashkov, A V; Reshetnyak, V Yu

    2001-03-31

    The effect of trans-cis photoisomerisation of azofragments of a polymer film on the molecular reorientation of a liquid crystal is studied. It is shown that, using nanosecond laser pulses, one can perform both the reversible and static data recording in liquid-crystal cells with an azo-modified surface. The rise time of the reorientation is measured by the methods of dynamic holography to be about {approx} 30 {mu}s, and the grating efficiency achieves 15 %. (laser applications and other topics in quantum electronics)

  17. Synthesis of oxidation resistant lead nanoparticle films by modified pulsed laser ablation

    SciTech Connect

    Shin, Eunsung; Murray, P. Terrence; Subramanyam, Guru; Malik, Hans K.; Schwartz, Kenneth L.

    2012-07-30

    Thin layers of lead nanoparticles have been produced by a modified pulsed laser ablation (PLA) process in which smaller nanoparticles were swept out of the ablation chamber by a stream of flowing Ar. Large ({mu}m-sized) particles, which are usually deposited during the standard PLA process, were successfully eliminated from the deposit. The nanoparticles deposited on room temperature substrates were well distributed, and the most probable particle diameter was in the order of 30 nm. Since lead is highly reactive, the nanoparticles formed in Ar were quickly oxidized upon exposure to air. A small partial pressure of H{sub 2}S gas was subsequently added to the effluent, downstream from the ablation chamber, and this resulted in the formation of nanoparticle deposits that were surprisingly oxidation resistant. The properties of the nanoparticle films (as determined by transmission electron microscopy, scanning electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, and conductivity measurements) are reported, and the mechanism of the oxidation retardation process is discussed.

  18. Dry etching technologies for the advanced binary film

    NASA Astrophysics Data System (ADS)

    Iino, Yoshinori; Karyu, Makoto; Ita, Hirotsugu; Yoshimori, Tomoaki; Azumano, Hidehito; Muto, Makoto; Nonaka, Mikio

    2011-11-01

    ABF (Advanced Binary Film) developed by Hoya as a photomask for 32 (nm) and larger specifications provides excellent resistance to both mask cleaning and 193 (nm) excimer laser and thereby helps extend the lifetime of the mask itself compared to conventional photomasks and consequently reduces the semiconductor manufacturing cost [1,2,3]. Because ABF uses Ta-based films, which are different from Cr film or MoSi films commonly used for photomask, a new process is required for its etching technology. A patterning technology for ABF was established to perform the dry etching process for Ta-based films by using the knowledge gained from absorption layer etching for EUV mask that required the same Ta-film etching process [4]. Using the mask etching system ARES, which is manufactured by Shibaura Mechatronics, and its optimized etching process, a favorable CD (Critical Dimension) uniformity, a CD linearity and other etching characteristics were obtained in ABF patterning. Those results are reported here.

  19. A Spectroscopic Comparison of Femtosecond Laser Modified Fused Silica using kHz and MHz Laser Systems.

    SciTech Connect

    Reichman, W J; Krol, D M; Shah, L; Yoshino, F; Arai, A; Eaton, S M; Herman, P R

    2005-09-29

    Waveguides were written in fused silica using both a femtosecond fiber laser with a 1 MHz pulse repetition rate and a femtosecond amplified Ti:sapphire laser with a 1 kHz repetition rate. Confocal Raman and fluorescence microscopy were used to study structural changes in the waveguides written with both systems. A broad fluorescence band, centered at 650 nm, associated with non-bridging oxygen hole center (NBOHC) defects was observed after waveguide fabrication with the MHz laser. With the kHz laser system these defects were only observed for pulse energies above 1 {mu}J. Far fewer NBOHC defects were formed with the MHz laser than with kHz writing, possibly due to thermal annealing driven by heat accumulation effects at 1 MHz. When the kHz laser was used with pulse energies below 1 {mu}J, the predominant fluorescence was centered at 550 nm, a band assigned to the presence of silicon clusters (E{prime}{sub {delta}}). We also observed an increase in the intensity of the 605 cm{sup -1} Raman peak relative to the total Raman intensity, corresponding to an increase in the concentration of 3-membered rings in the lines fabricated with both laser systems.

  20. Lasers.

    ERIC Educational Resources Information Center

    Schewe, Phillip F.

    1981-01-01

    Examines the nature of laser light. Topics include: (1) production and characteristics of laser light; (2) nine types of lasers; (3) five laser techniques including holography; (4) laser spectroscopy; and (5) laser fusion and other applications. (SK)

  1. Lasers.

    ERIC Educational Resources Information Center

    Schewe, Phillip F.

    1981-01-01

    Examines the nature of laser light. Topics include: (1) production and characteristics of laser light; (2) nine types of lasers; (3) five laser techniques including holography; (4) laser spectroscopy; and (5) laser fusion and other applications. (SK)

  2. Investigation of electrochemical etch differences in AlGaAs heterostructures using Cl{sub 2} ion beam assisted etching

    SciTech Connect

    Anglin, Kevin Goodhue, William D.; Swint, Reuel B.; Porter, Jeanne

    2015-03-15

    A deeply etched, anisotropic 45° and 90° mirror technology is developed for Al{sub x}Ga{sub 1−x}As heterostructures using a Cl{sub 2} ion beam assisted etching system. When etching vertically, using a conductive low-erosion Ni mask, electrochemical etch differences between layers with various Al mole fractions caused nonuniform sidewall profiles not seen in semi-insulating GaAs test samples. These variations, based on alloy composition, were found to be negligible when etching at a 45°. A Si{sub 3}N{sub 4}-Ni etch mask is designed in order to electrically isolate charge buildup caused by the incoming Ar{sup +} ion beam to the Ni layer, preventing conduction to the underlying epitaxial layers. This modification produced smoothly etched facets, up to 8 μm in depth, enabling fabrication of substrate–surface-emitting slab-coupled optical waveguide lasers and other optoelectronic devices.

  3. Laser Modified ZnO/CdSSe Core-Shell Nanowire Arrays for Micro-Steganography and Improved Photoconduction

    PubMed Central

    Lu, Junpeng; Liu, Hongwei; Zheng, Minrui; Zhang, Hongji; Lim, Sharon Xiaodai; Tok, Eng Soon; Sow, Chorng Haur

    2014-01-01

    Arrays of ZnO/CdSSe core/shell nanowires with shells of tunable band gaps represent a class of interesting hybrid nanomaterials with unique optical and photoelectrical properties due to their type II heterojunctions and chemical compositions. In this work, we demonstrate that direct focused laser beam irradiation is able to achieve localized modification of the hybrid structure and chemical composition of the nanowire arrays. As a result, the photoresponsivity of the laser modified hybrid is improved by a factor of ~3. A 3D photodetector with improved performance is demonstrated using laser modified nanowire arrays overlaid with monolayer graphene as the top electrode. Finally, by controlling the power of the scanning focused laser beam, micropatterns with different fluorescence emissions are created on a substrate covered with nanowire arrays. Such a pattern is not apparent when imaged under normal optical microscopy but the pattern becomes readily revealed under fluorescence microscopy i.e. a form of Micro-Steganography is achieved. PMID:25213321

  4. Spectroscopy and laser operation of Indium-modified Yb:KLuW: a promising crystal for femtosecond lasers

    NASA Astrophysics Data System (ADS)

    Mateos, Xavier; Serres, Josep Maria; Loiko, Pavel; Yumashev, Konstantin; Griebner, Uwe; Petrov, Valentin; Aguiló, Magdalena; Díaz, Francesc

    2017-02-01

    We report on the growth, spectroscopic and laser characterization of a novel monoclinic laser crystal, 3.5 at.% Yb, 5.5 at.% In:KLu(WO4)2 (Yb,In:KLuW). Single-crystals of high optical quality are grown by the TSSG method. The absorption, stimulated-emission and gain cross-sections are determined for this material at room temperature with polarized light. The maximum σabs is 9.9×10-20 cm2 at 980.8 nm for light polarization E || Nm. The radiative lifetime of Yb3+ in Yb,In:KLuW is 237+/-5 μs. The stimulated-emission cross-sections are σSE(m) = 2.4×10-20 cm2 at 1022.4 nm and σSE(p) = 1.3×10-20 cm2 at 1039.1 nm corresponding to an emission bandwidth of >30 nm and >35 nm, respectively. A diode-pumped Ng-cut Yb,In:KLuW microchip laser generates 4.11 W at 1047-1052 nm with a slope efficiency of 78%. Passive Q-switching of a Yb,In:KLuW laser is also demonstrated. The Yb,In:KLuW crystal seems very promising for sub-100 fs mode-locked lasers.

  5. On the use of CO 2 laser induced surface patterns to modify the wettability of poly(methyl methacrylate) (PMMA)

    NASA Astrophysics Data System (ADS)

    Waugh, David Garreth; Lawrence, Jonathan

    2010-06-01

    CO 2 lasers can be seen to lend themselves to materials processing applications and have been used extensively in both research and industry. This work investigated the surface modification of PMMA with a CO 2 laser in order to vary the wettability characteristics. The wettability characteristics of the PMMA were modified by generating a number of patterns of various topographies on the surface using the CO 2 laser. These induced patterns were trench and hatch with scan dimensions of 50 and 100 μm. Through white light interferometry, it was found that for all laser patterned samples, the surface roughness had significantly increased by up to 3.1 μm. The chemical composition of selected samples was explored using X-ray photoelectron spectroscopy and found that the surface oxygen content had risen by approximately 4 at%. By using a sessile drop device it was found that, in comparison to the as-received sample, 50 μm dimensions gave rise to a more hydrophilic surface; whereas 100 μm dimensions gave rise to either no change in contact angle or an increase making the PMMA hydrophobic. This can be explained by combinations of surface roughness and γp contributing to the observed contact angle, in addition to the possibility of different wetting regimes taking place owed to the variation of topographies over the as-received and laser patterned samples.

  6. Stability and etching of titanium oxynitride films in hydrogen microwave plasma

    SciTech Connect

    Do Hien; Yen, Tzu-Chun; Chang Li

    2013-07-15

    Epitaxial titanium oxynitride (TiNO) films deposited on MgO by pulsed laser deposition were treated in hydrogen microwave plasma. Scanning electron microscopy and x-ray photoelectron spectroscopy were used to examine the stability and etching of TiNO which strongly depended on hydrogen gas pressure. TiNO was very chemically stable and remained with good crystallinity under hydrogen pressure below 5300 Pa. With increase of pressure, it may lead to the formation of etch pits in inverse pyramid shape. The etch mechanism as well as the effects of gas pressure and etching time are also presented.

  7. Water-assisted CO(2) laser ablated glass and modified thermal bonding for capillary-driven bio-fluidic application.

    PubMed

    Chung, C K; Chang, H C; Shih, T R; Lin, S L; Hsiao, E J; Chen, Y S; Chang, E C; Chen, C C; Lin, C C

    2010-02-01

    The glass-based microfluidic chip has widely been applied to the lab-on-a-chip for clotting tests. Here, we have demonstrated a capillary driven flow chip using the water-assisted CO(2) laser ablation for crackless fluidic channels and holes as well as the modified low-temperature glass bonding with assistance of adhesive polymer film at 300 degrees Celsius. Effect of water depth on the laser ablation of glass quality was investigated. The surface hydrophilic property of glass and polymer film was measured by static contact angle method for hydrophilicity examination in comparison with the conventional polydimethylsiloxane (PDMS) material. Both low-viscosity deionized water and high-viscosity whole blood were used for testing the capillary-driving flow behavior. The preliminary coagulation testing in the Y-channel chip was also performed using whole blood and CaCl(2) solution. The water-assisted CO(2) laser processing can cool down glass during ablation for less temperature gradient to eliminate the crack. The modified glass bonding can simplify the conventional complex fabrication procedure of glass chips, such as high-temperature bonding, long consuming time and high cost. Moreover, the developed fluidic glass chip has the merit of hydrophilic behavior conquering the problem of traditional hydrophobic recovery of polymer fluidic chips and shows the ability to drive high-viscosity bio-fluids.

  8. Low damage dry etch for III-nitride light emitters

    NASA Astrophysics Data System (ADS)

    Nedy, Joseph G.; Young, Nathan G.; Kelchner, Kathryn M.; Hu, Yanling; Farrell, Robert M.; Nakamura, Shuji; DenBaars, Steven P.; Weisbuch, Claude; Speck, James S.

    2015-08-01

    We have developed a dry etch process for the fabrication of lithographically defined features close to light emitting layers in the III-nitride material system. The dry etch was tested for its effect on the internal quantum efficiency of c-plane InGaN quantum wells using the photoluminescence of a test structure with two active regions. No change was observed in the internal quantum efficiency of the test active region when the etched surface was greater than 71 nm away. To demonstrate the application of the developed dry etch process, surface-etched air gaps were fabricated 275 nm away from the active region of an m-plane InGaN/GaN laser diode and served as the waveguide upper cladding. Electrically injected lasing was observed without the need for regrowth or recovery anneals. This dry etch opens up a new design tool that can be utilized in the next generation of GaN light emitters.

  9. Individualized Learning Package about Etching.

    ERIC Educational Resources Information Center

    Sauer, Michael J.

    An individualized learning package provides step-by-step instruction in the fundamentals of the etching process. Thirteen specific behavioral objectives are listed. A pretest, consisting of matching 15 etching terms with their definitions, is provided along with an answer key. The remainder of the learning package teaches the 13 steps of the…

  10. Ultrasonic metal etching for metallographic analysis

    NASA Technical Reports Server (NTRS)

    Young, S. G.

    1971-01-01

    Ultrasonic etching delineates microstructural features not discernible in specimens prepared for metallographic analysis by standard chemical etching procedures. Cavitation bubbles in ultrasonically excited water produce preferential damage /etching/ of metallurgical phases or grain boundaries, depending on hardness of metal specimens.

  11. Optical properties of carbon nanostructures produced by laser irradiation on chemically modified multi-walled carbon nanotubes

    NASA Astrophysics Data System (ADS)

    Santiago, Enrique Vigueras; López, Susana Hernández; Camacho López, Marco A.; Contreras, Delfino Reyes; Farías-Mancilla, Rurik; Flores-Gallardo, Sergio G.; Hernández-Escobar, Claudia A.; Zaragoza-Contreras, E. Armando

    2016-10-01

    This research focused on the nanosecond (Nd: YAG-1064 nm) laser pulse effect on the optical and morphological properties of chemically modified multi-walled carbon nanotubes (MWCNT). Two suspensions of MWCNT in tetrahydrofuran (THF) were prepared, one was submitted to laser pulses for 10 min while the other (blank) was only mechanically homogenized during the same time. Following the laser irradiation, the suspension acquired a yellow-amber color, in contrast to the black translucent appearance of the blank. UV-vis spectroscopy confirmed this observation, showing the blank a higher absorption. Additionally, photoluminescence measurements exhibited a broad blue-green emission band both in the blank and irradiated suspension when excited at 369 nm, showing the blank a lower intensity. However, a modification in the excitation wavelength produced a violet to green tuning in the irradiated suspension, which did not occur in the blank. Lastly, the electron microscopy analysis of the treated nanotubes showed the abundant formation of amorphous carbon, nanocages, and nanotube unzipping, exhibiting the intense surface modification produced by the laser pulse. Nanotube surface modification and the coexistence with the new carbon nanostructures were considered as the conductive conditions for optical properties modification.

  12. Laser hydrothermal reductive ablation of titanium monoxide: Hydrated TiO particles with modified Ti/O surface

    SciTech Connect

    Blazevska-Gilev, Jadranka; Jandova, Vera; Kupcik, Jaroslav; Bastl, Zdenek; Subrt, Jan; Bezdicka, Petr; Pola, Josef

    2013-01-15

    IR laser- and UV laser-induced ablation of titanium monoxide (TM) in hydrogen (50 Torr) is compared to the same process induced in vacuum and shown to result in deposition of hydrated surface modified nanostructured titanium suboxide films. Complementary analyses of the films deposited in vacuum and in hydrogen by Fourier transform infrared, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy allowed to determine different features of both films and propose a mechanism of surface modification of ejected particles, which involves hydrothermal reduction of TM and subsequent reactions of evolved water. The films exert good adhesion to metal and quartz surfaces and are hydrophobic in spite of having their surface coated with adsorbed water. - Graphical abstract: Laser ablation of titanium monoxide (TiO) in hydrogen involves a sequence of H{sub 2} and H{sub 2}O eliminations and additions and yields hydrated amorphous nanostructured titanium suboxide which is richer in oxygen than TiO. Highlights: Black-Right-Pointing-Pointer IR and UV laser ablated particles of titanium monoxide (TiO) undergo amorphization. Black-Right-Pointing-Pointer Films deposited in vacuum have TiO stoichiometry and are oxidized in atmosphere. Black-Right-Pointing-Pointer Films deposited in hydrogen are hydrated and have more O in topmost layers. Black-Right-Pointing-Pointer Films modification in hydrogen is explained by reactions in hydrogen plasma.

  13. Investigation of impact of photonic crystal fiber structure modified by femtosecond laser micromachining on long period gratings' sensing characteristics

    NASA Astrophysics Data System (ADS)

    Liu, Shujing; Wu, Jingwei; Luo, Mingyan; Ji, Qiang

    2016-02-01

    The sensing characteristics of long period gratings (LPGs) in photonic crystal fiber (PCF) can be changed by using femtosecond laser to modify the PCF waveguide structure although dispersive characteristic plays a key role in determining the sensitivity. Based on the coupled local-mode theory, the coupling behaviors and spectral characteristics of the LPGs in PCF fabricated by a femtosecond laser and a CO2 laser are analyzed which are supported by experiment results. When the distance between the central of fiber core and the peak of the drilled hole, namely the micro-hole diameter is about 3.5 μm, the temperature and strain sensitivities are changed by 27% (from 6.20 to 7.81 pm/°C) and -21% (from -2.41 to -1.91 pm/με) in comparison with the changes of the sensitivities that is induced by CO2 laser. The investigation demonstrates that the local structural changes of PCF have an impact on the sensitivity of LPGs. The investigation demonstrates the versatility of the technique in potential applications to design the desired sensitivity of fiber grating flexibly by forming proper geometrical modulations.

  14. Surface Modification of Nitinol by Chemical and Electrochemical Etching

    NASA Astrophysics Data System (ADS)

    Yang, Zhendi; Wei, Xiaojin; Cao, Peng; Gao, Wei

    2013-07-01

    In this paper, Nitinol, an equiatomic binary alloy of nickel and titanium, was surface modified for its potential biomedical applications by chemical and electrochemical etching. The main objective of the surface modification is to reduce the nickel content on the surface of Nitinol and simultaneously to a rough surface microstructure. As a result, better biocompatibility and better cell attachment would be achieved. The effect of the etching parameters was investigated, using scanning electron microscopy (SEM) equipped with energy dispersive X-ray spectrometry (EDX) and X-ray photoelectron spectrometry (XPS). The corrosion property of modified Nitinol surfaces was investigated by electrochemical work station. After etching, the Ni content in the surface layer has been reduced and the oxidation of Ti has been enhanced.

  15. A Modified Risk Assessment Scoring System for Post Laser In Situ Keratomileusis Ectasia in Topographically Normal Patients

    PubMed Central

    Miraftab, Mohammad; Fotouhi, Akbar; Hashemi, Hassan; Jafari, Fatemeh; Shahnazi, Ashkan; Asgari, Soheila

    2014-01-01

    Purpose: To evaluate and modify the Randleman Ectasia Risk Score System for predicting post-laser in situ keratomileusis (LASIK) ectasia in patients with normal preoperative corneal topography. Methods: In this retrospective study we reviewed data from 136 eyes which had undergone LASIK including 34 ectatic and 102 normal eyes between 1999 and 2009. After determining the sensitivity and specificity of the Randleman system, a modified model was designed to predict the risk of post-LASIK corneal ectasia more accurately. Next, the sensitivity and specificity of this modified scoring system was determined and compared to that of the original scoring system. Results: In our sample, the sensitivity and specificity of the Randleman system was 70.1% and 50.5%, respectively. Our modified model included the following parameters: preoperative central corneal thickness, manifest refraction spherical equivalent, and maximum keratometry, as well as the number of months elapsed from surgery. Sensitivity and specificity rates of the modified system were 74.2% and 76.2%, respectively. The difference in receiver operating characteristic curves between the Randleman and modified scoring systems was statistically significant (P<0.001). The best sensitivity and specificity for our model occurred with a cumulative cutoff score of 4.00; a low risk was considered if the score was ≤4.00, and high risk was defined with a score > 4.00. Conclusion: Our modified ectasia risk scoring system for patients with normal corneal topography can predict post LASIK ectasia risk with acceptable sensitivity and specificity. However, there are still unidentified risk factors for which further studies are required. PMID:25709767

  16. A modified SAG technique for the fabrication of DWDM DFB laser arrays with highly uniform wavelength spacings.

    PubMed

    Zhang, Can; Liang, Song; Zhu, Hongliang; Wang, Baojun; Wang, Wei

    2012-12-31

    A modified selective area growth (SAG) technique, in which the effective index of only the upper separate confinement heterostructure (SCH) layer are modulated to obtain different emission wavelengths, is reported for the fabrication of dense wavelength division multiplexing (DWDM) multi-wavelength laser arrays (MWLAs). InP based 1.5 μm distributed feedback (DFB) laser arrays with 0.8 nm, 0.42 nm, and 0.19 nm channel separations are demonstrated, all showing highly uniform wavelength spacings. The standard deviation of the distribution of the wavelength residues with respect to the corresponding linear fitting values is 0.0672 nm, which is a lot smaller than those of the MWLAs fabricated by other techniques including electron beam lithography. These results indicate that our SAG technique which needs only a simple procedure is promising for the fabrication of low cost DWDM MWLAs.

  17. Between-cycle laser system for depressurization and resealing of modified design nuclear fuel assemblies

    DOEpatents

    Bradley, John G.

    1982-01-01

    A laser beam is used to puncture fuel cladding for release of contained pressurized fission gas from plenum sections or irradiated fuel pins. Exhausted fission gases are collected and trapped for safe disposal. The laser beam, adjusted to welding mode, is subsequently used to reseal the puncture holes. The fuel assembly is returned to additional irradiation or, if at end of reactivity lifetime, is routed to reprocess. The fuel assembly design provides graded cladding lengths, by rows or arrays, such that the cladding of each component fuel element of the assembly is accessible to laser beam reception.

  18. Modified Surface Having Low Adhesion Properties to Mitigate Insect Residue Adhesion

    NASA Technical Reports Server (NTRS)

    Wohl, Christopher J., Jr. (Inventor); Smith, Joseph G., Jr. (Inventor); Siochi, Emilie J. (Inventor); Penner, Ronald K. (Inventor)

    2016-01-01

    A process to modify a surface to provide reduced adhesion surface properties to mitigate insect residue adhesion. The surface may include the surface of an article including an aircraft, an automobile, a marine vessel, all-terrain vehicle, wind turbine, helmet, etc. The process includes topographically and chemically modifying the surface by applying a coating comprising a particulate matter, or by applying a coating and also topographically modifying the surface by various methods, including but not limited to, lithographic patterning, laser ablation and chemical etching, physical vapor phase deposition, chemical vapor phase deposition, crystal growth, electrochemical deposition, spin casting, and film casting.

  19. Plasma etching of cesium iodide

    NASA Astrophysics Data System (ADS)

    Yang, X.; Hopwood, J.; Tipnis, S.; Nagarkar, V.; Gaysinskiy, V.

    2002-01-01

    Thick films of cesium iodide (CsI) are often used to convert x-ray images into visible light. Spreading of the visible light within CsI, however, reduces the resolution of the resulting image. Anisotropic etching of the CsI film into an array of micropixels can improve the image resolution by confining light within each pixel. The etching process uses a high-density inductively coupled plasma to pattern CsI samples held by a heated, rf-biased chuck. Fluorine-containing gases such as CF4 are found to enhance the etch rate by an order of magnitude compared to Ar+ sputtering alone. Without inert-gas ion bombardment, however, the CF4 etch becomes self-limited within a few microns of depth due to the blanket deposition of a passivation layer. Using CF4+Ar continuously removes this layer from the lateral surfaces, but the formation of a thick passivation layer on the unbombarded sidewalls of etched features is observed by scanning electron microscopy. At a substrate temperature of 220 °C, the minimum ion-bombardment energy for etching is Ei~50 eV, and the rate depends on Ei1/2 above 65 eV. In dilute mixtures of CF4 and Ar, the etch rate is proportional to the gas-phase density of atomic fluorine. Above 50% CF4, however, the rate decreases, indicating the onset of net surface polymer deposition. These observations suggest that anisotropy is obtained through the ion-enhanced inhibitor etching mechanism. Etching exhibits an Arrhenius-type behavior in which the etch rate increases from ~40 nm/min at 40 °C to 380 nm/min at 330 °C. The temperature dependence corresponds to an activation energy of 0.13+/-0.01 eV. This activation energy is consistent with the electronic sputtering mechanism for alkali halides.

  20. Beam-shaping via femtosecond laser-modified optical fibre end faces

    NASA Astrophysics Data System (ADS)

    Ioannou, A.; Polis, M.; Lacraz, A.; Theodosiou, A.; Kalli, K.

    2016-04-01

    We present the results of investigations regarding laser micro-structuring of single mode optical fibres by direct access of the fibre end face and compare this with inscription in planar samples. We combine a high numerical aperture objective and femtosecond laser radiation at visible wavelengths to examine the spatial limits of direct writing and structuring at the surface of the optical fibre. We realise a number of interesting devices from one- and two-dimensional grating structures, to Bessel, Airy and vortex beam generators. We show the versatility of this simple but effective inscription method, where we demonstrate classic multiple slit diffraction patterns and patterns for non-diffracting beams, confirming that the flexible direct write method using femtosecond lasers can be to produce binary masks that can lead to beam shaping using a method that is applicable to all types of planar samples and through fine control of laser parameters to multi-mode and singlemode optical fibres.

  1. Structural relaxation phenomena in silicate glasses modified by irradiation with femtosecond laser pulses

    PubMed Central

    Seuthe, Thomas; Mermillod-Blondin, Alexandre; Grehn, Moritz; Bonse, Jörn; Wondraczek, Lothar; Eberstein, Markus

    2017-01-01

    Structural relaxation phenomena in binary and multicomponent lithium silicate glasses were studied upon irradiation with femtosecond (fs) laser pulses (800 nm central wavelength, 130 fs pulse duration) and subsequent thermal annealing experiments. Depending on the annealing temperature, micro-Raman spectroscopy analyses evidenced different relaxation behaviours, associated to bridging and non-bridging oxygen structures present in the glass network. The results indicate that the mobility of lithium ions is an important factor during the glass modification with fs-laser pulses. Quantitative phase contrast imaging (spatial light interference microscopy) revealed that these fs-laser induced structural modifications are closely related to local changes in the refractive index of the material. The results establish a promising strategy for tailoring fs-laser sensitivity of glasses through structural mobility. PMID:28266615

  2. Performance properties of electro-spark deposited carbide-ceramic coatings modified by laser beam

    NASA Astrophysics Data System (ADS)

    Radek, Norbert; Bartkowiak, Konrad

    The work presented in this paper determines the influence of the laser treatment process on the properties of electrospark coatings. The properties after laser treatment were examined by microstructure analysis, microhardness, roughness and adhesion tests. The studies were conducted using WC-Co-Al2O3 electrodes produced by sintering nanostructural powders. The anti-wear coatings were first deposited by an EIL-8A apparatus on C45 carbon steel and then laser melted within various process parameters. In this case Nd:YAG laser (BLS 720 model) was applied. The electro-spark deposited coatings are very promising to improve abrasive wear resistance of tools and machine parts, which was indicated by tribological tests.

  3. Structural relaxation phenomena in silicate glasses modified by irradiation with femtosecond laser pulses

    NASA Astrophysics Data System (ADS)

    Seuthe, Thomas; Mermillod-Blondin, Alexandre; Grehn, Moritz; Bonse, Jörn; Wondraczek, Lothar; Eberstein, Markus

    2017-03-01

    Structural relaxation phenomena in binary and multicomponent lithium silicate glasses were studied upon irradiation with femtosecond (fs) laser pulses (800 nm central wavelength, 130 fs pulse duration) and subsequent thermal annealing experiments. Depending on the annealing temperature, micro-Raman spectroscopy analyses evidenced different relaxation behaviours, associated to bridging and non-bridging oxygen structures present in the glass network. The results indicate that the mobility of lithium ions is an important factor during the glass modification with fs-laser pulses. Quantitative phase contrast imaging (spatial light interference microscopy) revealed that these fs-laser induced structural modifications are closely related to local changes in the refractive index of the material. The results establish a promising strategy for tailoring fs-laser sensitivity of glasses through structural mobility.

  4. INL Internship:Modification of Metal Contaminants on Oxide Surfaces Modified by Laser Irradiation

    SciTech Connect

    Michael J. Hansen; Robert Fox; Les Manner

    2006-08-01

    This project focuses on obtaining the optimal laser parameters needed for enhancing metal contaminants on cement, granite, and marble. The various parameters of the laser tested include the fluence, wavelength, and frequency. A chelating study was also performed in order to increase the volatility of cobalt. In the following paper each experiment is described in detail. No results are included in this report because their release is not approved and they could eventually become classified.

  5. Modified diglycol-amides for actinide separation: solvent extraction and time-resolved laser fluorescence spectroscopy complexation studies

    SciTech Connect

    Wilden, A.; Modolo, G.; Lange, S.; Sadowski, F.; Bosbach, D.; Beele, B.B.; Panak, P.J.; Skerencak-Frech, A.; Geist, A.; Iqbal, M.; Verboom, W.

    2013-07-01

    In this work, the back-bone of the diglycolamide-structure of the TODGA extractant was modified by adding one or two methyl groups to the central methylene carbon-atoms. The influence of these structural modifications on the extraction behavior of trivalent actinides and lanthanides and other fission products was studied in solvent extraction experiments. The addition of methyl groups to the central methylene carbon atoms leads to reduced distribution ratios, also for Sr(II). This reduced extraction efficiency for Sr(II) is beneficial for process applications, as the co-extraction of Sr(II) can be avoided, resulting in an easier process design. The use of these modified diglycol-amides in solvent extraction processes is discussed. Furthermore, the complexation of Cm(III) and Eu(III) to the ligands was studied using Time-Resolved-Laser-Fluorescence-Spectroscopy (TRLFS). The complexes were characterized by slope analysis and conditional stability constants were determined.

  6. Layer-by-layer etching of LaAlSiO x

    NASA Astrophysics Data System (ADS)

    Omura, Mitsuhiro; Furumoto, Kazuhito; Matsuda, Kazuhisa; Sasaki, Toshiyuki; Sakai, Itsuko; Hayashi, Hisataka

    2017-06-01

    Layer-by-layer etching of LaAlSiO x using surface modification and selective removal steps was investigated. Selective removal of the LaAlSiO x layer modified by H2 plasma treatment was achieved by bias-power-adjusted C4F8/Ar plasma treatment. Self-limiting etching of LaAlSiO x with respect to the C4F8/Ar plasma step time was realized by initializing the chamber condition using O2 plasma. It was possible to control the saturation etching depth by changing the ion energy of the H2 plasma treatment. The repeatability of the self-limiting etching was confirmed, and the etching depth per cycle was about 0.6 nm. Layer-by-layer etching of LaAlSiO x was thus successfully realized using a three-step sequential process employing H2, C4F8/Ar and O2 plasmas.

  7. Catalytic activity of noble metals for metal-assisted chemical etching of silicon

    PubMed Central

    2012-01-01

    Metal-assisted chemical etching of silicon is an electroless method that can produce porous silicon by immersing metal-modified silicon in a hydrofluoric acid solution without electrical bias. We have been studying the metal-assisted hydrofluoric acid etching of silicon using dissolved oxygen as an oxidizing agent. Three major factors control the etching reaction and the porous silicon structure: photoillumination during etching, oxidizing agents, and metal particles. In this study, the influence of noble metal particles, silver, gold, platinum, and rhodium, on this etching is investigated under dark conditions: the absence of photogenerated charges in the silicon. The silicon dissolution is localized under the particles, and nanopores are formed whose diameters resemble the size of the metal nanoparticles. The etching rate of the silicon and the catalytic activity of the metals for the cathodic reduction of oxygen in the hydrofluoric acid solution increase in the order of silver, gold, platinum, and rhodium. PMID:22738277

  8. Improving intergranular corrosion resistance of sensitized type 316 austenitic stainless steel by laser surface melting

    NASA Astrophysics Data System (ADS)

    Mudali, U. K.; Dayal, R. K.

    1992-06-01

    An attempt was made to modify the surface microstructure of a sensitized austenitic stainless steel, without affecting the bulk properties, using laser surface melting techniques. AISI type 316 stainless steel specimens sensitized at 923 K for 20 hr were laser surface melted using a pulsed ruby laser at 6 J energy. Two successive pulses were given to ensure uniform melting and homogenization. The melted layers were characterized by small angle X- ray diffraction and scanning electron microscopy. Intergranular corrosion tests were carried out on the melted region as per ASTM A262 practice A (etch test) and electrochemical potentiokinetic reactivation test. The results indicated an improvement in the intergranular corrosion resistance after laser surface melting. The results are explained on the basis of homogeneous and nonsensitized microstructure obtained at the surface after laser surface melting. It is concluded that laser surface melting can be used as an in situ method to increase the life of a sensitized component by modifying the surface microstructure.

  9. Submicron patterned metal hole etching

    DOEpatents

    McCarthy, Anthony M.; Contolini, Robert J.; Liberman, Vladimir; Morse, Jeffrey

    2000-01-01

    A wet chemical process for etching submicron patterned holes in thin metal layers using electrochemical etching with the aid of a wetting agent. In this process, the processed wafer to be etched is immersed in a wetting agent, such as methanol, for a few seconds prior to inserting the processed wafer into an electrochemical etching setup, with the wafer maintained horizontal during transfer to maintain a film of methanol covering the patterned areas. The electrochemical etching setup includes a tube which seals the edges of the wafer preventing loss of the methanol. An electrolyte composed of 4:1 water: sulfuric is poured into the tube and the electrolyte replaces the wetting agent in the patterned holes. A working electrode is attached to a metal layer of the wafer, with reference and counter electrodes inserted in the electrolyte with all electrodes connected to a potentiostat. A single pulse on the counter electrode, such as a 100 ms pulse at +10.2 volts, is used to excite the electrochemical circuit and perform the etch. The process produces uniform etching of the patterned holes in the metal layers, such as chromium and molybdenum of the wafer without adversely effecting the patterned mask.

  10. Evaluation of intraocular pressure elevation in a modified laser-induced glaucoma rat model.

    PubMed

    Biermann, Julia; van Oterendorp, Christian; Stoykow, Christian; Volz, Cornelia; Jehle, Thomas; Boehringer, Daniel; Lagrèze, Wolf Alexander

    2012-11-01

    The main drawbacks of currently described pressure induced glaucoma animal models are, that intraocular pressure (IOP) either rises slowly, leading to a heterogeneous onset of glaucoma in the treated animals or that IOP normalizes before significant damage occurs, necessitating re-treatment. Furthermore, a variable magnitude of IOP increase often results when particles are introduced into the anterior chamber. In order to develop a simple and reproducible rat glaucoma model with sustained IOP elevation after a single treatment we induced occlusion of the chamber angle by anterior chamber paracentesis and subsequent laser coagulation of the limbal area with 35, 40 or 45 laser burns. Right eyes served as controls. IOP was measured three times weekly using TonoLab rebound tonometry in awake animals. After four weeks, retinal tissue was harvested and processed for whole mount preparation. The number of prelabeled, fluorogold-positive retinal ganglion cells (RGCs) was analyzed under a fluorescence microscope. The eyes were further analyzed histologically. Results are expressed as means and standard deviation. Amplitude and duration of the IOP elevation increased with the number of laser burns. Two weeks after 35, 40 or 45 translimbal laser burns the IOP difference between treated and control eye was 7.5 ± 5, 14 ± 8 or 19 ± 9 mmHg, respectively; the RGC density/mm(2) 28 days after treatment was 1488 ± 238 for control eyes (n = 31) and 1514 ± 287 (n = 10), 955 ± 378 (n = 10) or 447 ± 350 (n = 11) for the respective laser groups. Mean IOP of all control eyes over the observation period was 12.4 ± 0.8 mmHg. The chamber angle showed pigment accumulation in the trabecular meshwork of all laser groups and confluent peripheral anterior synechia after 40 and 45 laser burns. Histologic examination of the retina revealed increasing glia activation in a pressure dependant manner. In this study, >91% of laser treated rats developed secondary glaucoma with sustained IOP

  11. Parameter dependence of marginal microleakage in Er:YAG-laser-ablated and -modified dental preparations

    NASA Astrophysics Data System (ADS)

    Wilder-Smith, Petra B. B.; Choi, Sam; Kurosaki, Tom

    1998-04-01

    Previous studies have shown that the status of the residual tooth surface after hard dental tissue ablation using laser irradiation may vary depending on the parameter combinations and cooling mechanisms used. The purpose of this investigation was to assess the effects of Er:YAG laser cavity preparation at different fluences on microleakage of glass ionomer and composite resin restorations. In freshly extracted clinically and radiographically healthy human anterior teeth, standardized Class V cavities were prepared using the dental drill or the Er:YAG laser (Quantronix 294). Fluences of 10 - 40J/cm2 were used at a p.r.r. of 1 Hz and pulse durations of 250 microseconds under an air/water coolant spray. Thirty three teeth were included in each subgroup; 3 teeth were used for light microscopy and SEM; 15 underwent conventional restoration with glass ionomer and 15 with composite resin. After immersion in 5% methylene blue, dye penetration was measured linearly in 5 standardized locations on each of the bisected samples. Using the Pearson correlation coefficients, microleakage correlated strongly with laser fluence for glass ionomer (p equals 0.0238) and for composite resin (p equals 0.0099) restorations. Results differed significantly between the 2 restoration types (p less than 0.05). In conclusion, the parameters used during laser ablation of dental tissues must be carefully controlled to optimize clinical outcome.

  12. Thermal effects from modified endodontic laser tips used in the apical third of root canals with erbium-doped yttrium aluminium garnet and erbium, chromium-doped yttrium scandium gallium garnet lasers.

    PubMed

    George, Roy; Walsh, Laurence J

    2010-04-01

    To evaluate the temperature changes occurring on the apical third of root surfaces when erbium-doped yttrium aluminium garnet (Er:YAG) and erbium, chromium-doped yttrium scandium gallium garnet (Er,Cr:YSGG) laser energy was delivered with a tube etched, laterally emitting conical tip and a conventional bare design optical fiber tip. Thermal effects of root canal laser treatments on periodontal ligament cells and alveolar bone are of concern in terms of safety. A total of 64 single-rooted extracted teeth were prepared 1 mm short of the working length using rotary nickel-titanium Pro-Taper files to an apical size corresponding to a F5 Pro-Taper instrument. A thermocouple located 2 mm from the apex was used to record temperature changes arising from delivery of laser energy through laterally emitting conical tips or plain tips, using an Er:YAG or Er,Cr:YSGG laser. For the Er:YAG and Er,Cr:YSGG systems, conical fibers showed greater lateral emissions (452 + 69% and 443 + 64%) and corresponding lower forward emissions (48 + 5% and 49 + 5%) than conventional plain-fiber tips. All four combinations of laser system and fiber design elicited temperature increases less than 2.5 degrees C during lasing. The use of water irrigation attenuated completely the thermal effects of individual lasing cycles. Laterally emitting conical fiber tips can be used safely under defined conditions for intracanal irradiation without harmful thermal effects on the periodontal apparatus.

  13. Treatment of lumbar disc herniation by percutaneous laser disc decompression (PLDD) and modified PLDD

    NASA Astrophysics Data System (ADS)

    Chi, Xiao fei; Li, Hong zhi; Wu, Ru zhou; Sui, Yun xian

    2005-07-01

    Objective: To study the micro-invasive operative method and to compare the effect of treatment of PLDD and modified PLDD for Lumbar Disc Herniation. Method: Vaporized part of the nucleus pulposus in single or multiple point after acupuncture into lumbar disc, to reach the purpose of the decompression of the lumbar disc. Result: Among the 19 cases of the regular PLDD group, the excellent and good rate was 63.2%, and among the 40 cases of the modified PLDD group, the excellent and good rate was 82.5%. Conclusion: The modified PLDD has good effect on the treatment for lumbar disc herniation.

  14. The adsorption of human serum albumin (HSA) on CO2 laser modified magnesia partially stabilised zirconia (MgO-PSZ).

    PubMed

    Hao, L; Lawrence, J

    2004-03-15

    Magnesia partially stabilised zirconia (MgO-PSZ), a bioinert ceramic, exhibits high mechanical strength, excellent corrosion resistance and good biocompatibility, but it does not naturally form a direct bond with bone resulting in a lack of osteointegration. The surface properties and structure of a biomaterial play an essential role in protein adsorption. As such, changes in the surface properties and structure of biomaterials may in turn alter their bioactivity. So, the fundamental reactions at the interface of biomaterials and tissue should influence their integration and bone-bonding properties. To this end, CO2 laser radiation was used to modify the surface roughness, crystal size, phase and surface energy of the MgO-PSZ. The basic mechanisms active in improving the surface energy were analysed and found to be the phase change and augmented surface area. The adsorption of human serum albumin (HSA), which is a non-cell adhesive protein, was compared on the untreated and CO2 laser modified MgO-PSZ. It was observed that the thickness of the adsorbed HSA decreased as the polar surface energy of the MgO-PSZ increased, indicating that HSA adsorbed more effectively on the hydrophobic MgO-PSZ surface than the hydrophilic surface. The current study provided important information regarding protein-biomaterial interactions and possible mechanisms behind the cell interaction and in vivo behaviour.

  15. Postoperative sensitivity of self etch versus total etch adhesive.

    PubMed

    Yousaf, Ajmal; Aman, Nadia; Manzoor, Manzoor Ahmed; Shah, Jawad Ali; Dilrasheed

    2014-06-01

    To compare postoperative sensitivity following composite restoration placed in supra gingival class-V cavities using self etch adhesive and total etch adhesive. A randomized clinical trial. Operative Dentistry Department of Armed Forces Institute of Dentistry, Rawalpindi, from July to December 2009. A total of 70 patients having class-V supra gingival carious lesions were divided into two groups. Classes-V cavities not exceeding 3 mm were prepared. One treatment group was treated with self etch adhesive (adhe SE one Ivoclar) and the control group was treated with total-etch adhesive (Eco-Etch Ivoclar) after acid etching with 37% phosphoric acid. Light cured composite (Te-Econom Ivoclar) restoration was placed for both groups and evaluated for postoperative sensitivity immediately after restoration, after 24 hours and after one week. Data was recorded on visual analogue scale. Comparison of sensitivity between the two treatment groups on application cold stimulus after 24 hours of restoration showed significant difference; however, no statistically significant difference was observed at baseline, immediately after restoration and at 1 week follow-up with cold stimulus or compressed air application. Less postoperative sensitivity was observed at postoperative 24 hours assessment in restoration placed using SE adhesives compared to TE adhesives. Thus, the use of SE adhesives may be helpful in reducing postoperative sensitivity during 24 hours after restoration placement.

  16. Controlling Dopant Profiles in Hyperdoped Silicon by Modifying Dopant Evaporation Rates During Pulsed Laser Melting

    SciTech Connect

    Recht, D.; Sullivan, J. T.; Reedy, R.; Buonassisi, T.; Aziz, M. J.

    2012-03-12

    We describe a method to control the sub-surface dopant profile in 'hyperdoped' silicon fabricated by ion implantation and pulsed laser melting. Dipping silicon ion implanted with sulfur into hydrofluoric acid prior to nanosecond pulsed laser melting leads to a tenfold increase in the rate of sulfur evaporation from the surface of the melt. This results in an 80% reduction of the near-surface dopant concentration, effectively embedding the hyperdoped region in a layer up to 180 nm beneath the surface. This method should facilitate the development of blocked impurity band devices.

  17. Nonlinear theory of intense laser-plasma interactions modified by vacuum polarization effects

    SciTech Connect

    Chen, Wenbo; Bu, Zhigang; Li, Hehe; Luo, Yuee; Ji, Peiyong

    2013-07-15

    The classical nonlinear theory of laser-plasma interactions is corrected by taking account of the vacuum polarization effects. A set of wave equations are obtained by using the Heisenberg-Euler Lagrangian density and the derivative correction with the first-order quantum electrodynamic effects. A model more suitable to formulate the interactions of ultra-strong lasers and high-energy-density plasmas is developed. In the result, some environments in which the effects of vacuum polarization will be enhanced are discussed.

  18. Modified femtosecond laser inscription method for tailored grating sensors in encapsulated silica and low-loss polymer optical fibres

    NASA Astrophysics Data System (ADS)

    Kalli, Kyriacos; Lacraz, Amedee; Theodosiou, Andreas; Kofinas, Marios

    2016-05-01

    There is great interest in the development of flexible wavelength filters and optical fibre sensors, such as Bragg and superstructure gratings, grating arrays and chirped gratings in glass and polymer optical fibres. A major hurdle is the development of an inscription method that should offer flexibility and reliability and be generally applicable to all optical fibre types. With this in mind we have developed a novel femtosecond laser inscription method; plane-by-plane inscription, whereby a 3D-index change of controlled length across the fibre core, width along the fibre axis and depth is written into the optical fibre. We apply this method for the inscription of various grating types in coated silica and low- loss CYTOP polymer optical fibres. The plane-by-plane method allows for multiple and overlapping gratings in the fibre core. Moreover, we demonstrate that this novel fibre Bragg grating inscription technique can be used to modify and add versatility to an existing, encapsulated optical fibre pressure sensor. The femtosecond laser is operated in the green or the near infra-red, based on the material properties under laser modification.

  19. Northern Arabia Etched Terrain

    NASA Technical Reports Server (NTRS)

    2002-01-01

    (Released 23 May 2002) The Science Many places on Mars display scabby, eroded landscapes that commonly are referred to as etched terrain. These places have a ragged, tortured look that reveals a geologic history of intense deposition and erosion. This THEMIS image shows such a place. Here a 10 km diameter crater is superposed on the floor of a 40 km diameter crater, most of which is outside of the image but apparent in the MOLA context image. The rugged crater rim material intermingles with low, flat-topped mesas and layers with irregular outlines along with dune-like ridges on many of the flat surfaces. The horizontal layers that occur throughout the scene at different elevations are evidence of repeated episodes of deposition. The apparent ease with which these deposits have been eroded, most likely by wind, suggests that they are composed of poorly consolidated material. Air-fall sediments are the likely candidate for this material rather than lava flows. The dune-like ridges are probably inactive granule ripples produced from the interaction of wind and erosional debris. The large interior crater displays features that are the result of deposition and subsequent erosion. Its raised rim is barely discernable due to burial while piles and blocks of slumped material along the interior circumference attest to the action of erosion. Some of the blocks retain the same texture as the surrounding undisrupted surface. It appears as if the crater had been buried long enough for the overlying material to be eroded into the texture seen today. Then at some point this overburden foundered and collapsed into the crater. Continuing erosion has caused the upper layer to retreat back from what was probably the original rim of the crater, producing the noncircular appearance seen today. The length of time represented by this sequence of events as well as the conditions necessary to produce them are unknown. The Story Have you ever seen an ink etching, where the artistic cross

  20. Northern Arabia Etched Terrain

    NASA Technical Reports Server (NTRS)

    2002-01-01

    (Released 23 May 2002) The Science Many places on Mars display scabby, eroded landscapes that commonly are referred to as etched terrain. These places have a ragged, tortured look that reveals a geologic history of intense deposition and erosion. This THEMIS image shows such a place. Here a 10 km diameter crater is superposed on the floor of a 40 km diameter crater, most of which is outside of the image but apparent in the MOLA context image. The rugged crater rim material intermingles with low, flat-topped mesas and layers with irregular outlines along with dune-like ridges on many of the flat surfaces. The horizontal layers that occur throughout the scene at different elevations are evidence of repeated episodes of deposition. The apparent ease with which these deposits have been eroded, most likely by wind, suggests that they are composed of poorly consolidated material. Air-fall sediments are the likely candidate for this material rather than lava flows. The dune-like ridges are probably inactive granule ripples produced from the interaction of wind and erosional debris. The large interior crater displays features that are the result of deposition and subsequent erosion. Its raised rim is barely discernable due to burial while piles and blocks of slumped material along the interior circumference attest to the action of erosion. Some of the blocks retain the same texture as the surrounding undisrupted surface. It appears as if the crater had been buried long enough for the overlying material to be eroded into the texture seen today. Then at some point this overburden foundered and collapsed into the crater. Continuing erosion has caused the upper layer to retreat back from what was probably the original rim of the crater, producing the noncircular appearance seen today. The length of time represented by this sequence of events as well as the conditions necessary to produce them are unknown. The Story Have you ever seen an ink etching, where the artistic cross

  1. High precision AlGaAsSb ridge-waveguide etching by in situ reflectance monitored ICP-RIE

    NASA Astrophysics Data System (ADS)

    Tran, N. T.; Breivik, Magnus; Patra, S. K.; Fimland, Bjørn-Ove

    2014-05-01

    GaSb-based semiconductor diode lasers are promising candidates for light sources working in the mid-infrared wavelength region of 2-5 μm. Using edge emitting lasers with ridge-waveguide structure, light emission with good beam quality can be achieved. Fabrication of the ridge waveguide requires precise etch stop control for optimal laser performance. Simulation results are presented that show the effect of increased confinement in the waveguide when the etch depth is well-defined. In situ reflectance monitoring with a 675 nm-wavelength laser was used to determine the etch stop with high accuracy. Based on the simulations of laser reflectance from a proposed sample, the etching process can be controlled to provide an endpoint depth precision within +/- 10 nm.

  2. Controlled in situ etch-back

    NASA Technical Reports Server (NTRS)

    Mattauch, R. J.; Seabaugh, A. C. (Inventor)

    1981-01-01

    A controlled in situ etch-back technique is disclosed in which an etch melt and a growth melt are first saturated by a source-seed crystal and thereafter etch-back of a substrate takes place by the slightly undersaturated etch melt, followed by LPE growth of a layer by the growth melt, which is slightly supersaturated.

  3. Channeling and diffusion in dry-etch damage

    NASA Astrophysics Data System (ADS)

    Rahman, M.

    1997-09-01

    At present channeling is accepted to be the primary mechanism causing defects deep within dry-etched material, with diffusion possibly modifying the final defect distribution. In this article detailed analytic expressions are presented incorporating both these mechanisms. The dominant parameter affecting damage depth is found to be the mean channeling length. We show how enhanced diffusion, e.g., by illumination, may increase the observed damage. We also study the effect of damage on depletion depths and suggest how the channeling length may be inferred from the etch-depth dependence of conductance or Raman spectroscopy measurements.

  4. Etching Of Semiconductor Wafer Edges

    DOEpatents

    Kardauskas, Michael J.; Piwczyk, Bernhard P.

    2003-12-09

    A novel method of etching a plurality of semiconductor wafers is provided which comprises assembling said plurality of wafers in a stack, and subjecting said stack of wafers to dry etching using a relatively high density plasma which is produced at atmospheric pressure. The plasma is focused magnetically and said stack is rotated so as to expose successive edge portions of said wafers to said plasma.

  5. Shear bond strength of resin-modified glass ionomer cements to Er:YAG laser-treated tooth structure.

    PubMed

    de Souza-Gabriel, Aline Evangelista; do Amaral, Flávia Lucisano Botelho; Pécora, Jesus Djalma; Palma-Dibb, Regina Guenka; Corona, Silmara Aparecida Milori

    2006-01-01

    This study evaluated the effect of Er:YAG laser irradiation of enamel and dentin on the shear bond strength of resin-modified glass ionomer cements (RMGIC). Twenty molars were selected and the roots removed. The crowns were bisected, embedded in polyester resin and ground to plane the enamel or expose the dentin. The bonding site was delimited, and samples were randomly assigned according to the cavity preparation device: I--Er.YAG laser (350mJ/2Hz); II--Carbide bur (control group). They were subdivided according to the restorative material employed: A) Fuji II LC (GC); B) Vitremer (3M). Samples were then fixed to a metallic device where ionomer cylinders were prepared. Sequentially, the molars were stored for 24 hours and subjected to a shear bond strength test (50Kgf at 0.5 mm/minute). Means in MPa were: Enamel--IA) 4.77 (+/- 1.12); IB) 4.36 (+/- 1.50); IIA) 7.70 (+/- 1.53); IIB) 7.34 (+/- 1.52) and Dentin--IA) 3.13 (+/- 1.15); IB) 2.67 (+/- 0.74); IIA) 6.38 (+/- 1.44); IIB) 5.58 (+/-2.09). Data were submitted to statistical analysis by ANOVA. Adhesion for enamel was more efficient than for dentin (p < 0.01). The cavities prepared with a conventional bur (control group) presented higher bond strength values than those recorded for Er:YAG laser (p < 0.01). No significant differences were observed between the restorative materials. Based on these results, it was concluded that Er:YAG laser adversely affected the shear bond strength of RMGIC for both enamel and dentin.

  6. UV Enhancement of CR-39 Nuclear Track Detector Etch Parameters

    NASA Astrophysics Data System (ADS)

    Traynor, Nathan; McLauchlin, Christopher; Dodge, Kenneth; McLean, James; Padalino, Stephen; Burke, Michelle; Sangster, Craig

    2014-03-01

    CR-39 plastic is an effective and commonly used solid state nuclear track detector. High-energy charged particles leave tracks of chemical damage. When CR-39 is chemically etched with NaOH at elevated temperatures, pits are produced at the track sites that are measurable by an optical microscope. We have shown that by exposing the CR-39 to high intensity UV light between nuclear irradiation and chemical etching, the rate at which the pits grow during etching is increased. The effect has been observed for wavelengths shorter than 350 nm, to at least 250 nm. Heating of samples during UV exposure dramatically increases the etch rates, although heating alone does not produce the effect. The pit enhancement is the result of an increase in both the bulk and track etch rates, while the ratio of these rates (which determines sensitivity to particles) remains roughly constant. By determining the best processing parameters, this effect promises to significantly reduce the time required to process CR-39 track detectors. Funded in part by a grant from the DOE through the Laboratory for Laser Energetics.

  7. Method of etching zirconium diboride

    SciTech Connect

    Heath, L.S.; Kwiatkowski, B.

    1988-03-31

    The invention described herein may be manufactured, used, and licensed by or for the Government for governmental purposes without the payment to us of any royalty thereon. This invention relates in general to a method of etching, zirconium diboride(ZrB/sub 2/) and, in particular, to a method of dry etching a thin film of ZrB/sub 2/ that has been deposited onto a substrate and patterned using photolithography. U.S. patent application S.N. 156, 124, filed 16 February, 1988, of Linda S. Heath for Method of Etching Titanium Diboride and assigned to a common assignee and with which this application is copending describes and claims a method of etching titanium diboride with a dry etch. Zirconium diboride, like titanium diboride, TiB/sub 2/, has become of interest in laboratory research because of its resistance to change or degradation at high temperatures. By adjusting the process parameters, one is able to attain etch rates of 67 to 140 A/min for ZrB/sub 2/. This is useful for patterning ZrB/sub 2/ as a diffusion barrier or a Schottky contact to semiconductors. The ZrB/sub 2/ film may be on a GaAs substrate.

  8. Corrosion and wear properties of laser surface modified NiTi with Mo and ZrO 2

    NASA Astrophysics Data System (ADS)

    Ng, K. W.; Man, H. C.; Yue, T. M.

    2008-08-01

    Because of its biocompatibility, superelasticity and shape memory characteristics, NiTi alloys have been gaining immense interest in the medical field. However, there is still concern on the corrosion resistance of this alloy if it is going to be implanted in the human body for a long time. Titanium is not toxic but nickel is carcinogenic and is implicated in various reactions including allergic response and degeneration of muscle tissue. Debris from wear and the subsequent release of Ni + ions due to corrosion in the body system are fatal issues for long-term application of this alloy in the human body. This paper reports the corrosion and wear properties of laser surface modified NiTi using Mo and ZrO 2 as surface alloying elements, respectively. The modified layers which are free from microcracks and porosity, act as both physical barrier to nickel release and enhance the bulk properties, such as hardness, wear resistance, and corrosion resistance. The electrochemical performance of the surface modified alloy was studied in Hanks' solution. Electrochemical impedance spectroscopy was measured.

  9. Dynamic Pattern Formation in Electron-Beam-Induced Etching [Emergent formation of dynamic topographic patterns in electron beam induced etching

    DOE PAGES

    Martin, Aiden A.; Bahm, Alan; Bishop, James; ...

    2015-12-15

    Here, we report highly ordered topographic patterns that form on the surface of diamond, span multiple length scales, and have a symmetry controlled by the precursor gas species used in electron-beam-induced etching (EBIE). The pattern formation dynamics reveals an etch rate anisotropy and an electron energy transfer pathway that is overlooked by existing EBIE models. Therefore, we, modify established theory such that it explains our results and remains universally applicable to EBIE. Furthermore, the patterns can be exploited in controlled wetting, optical structuring, and other emerging applications that require nano- and microscale surface texturing of a wide band-gap material.

  10. Modified FIR thermometry for surface temperature sensing by using high power laser.

    PubMed

    Wang, Ran; Zhang, Xinlu; Zhang, Zhilin; Zhong, Hujiang; Chen, Yujin; Zhao, Enming; Vasilescu, Steven; Liu, Lu

    2017-01-23

    The FIR (fluorescence intensity ratio) technique for optical thermometry has attracted considerable attention over recent years due to its high sensitivity and high spatial resolution. However, it is thought that a heating effect induced by incident light may lead to temperature overestimations, which in turn impedes the reliability of this technique for applications which require high levels of accuracy. To further improve the FIR technique, this paper presents a modified calibration expression, which is suitable for surface temperature sensing, based on the temperature distribution (calculated through COMSOL software). In addition, this modified method is verified by the experimental data.

  11. Dry Ice Etches Terrain

    NASA Technical Reports Server (NTRS)

    2007-01-01

    [figure removed for brevity, see original site] Figure 1

    Every year seasonal carbon dioxide ice, known to us as 'dry ice,' covers the poles of Mars. In the south polar region this ice is translucent, allowing sunlight to pass through and warm the surface below. The ice then sublimes (evaporates) from the bottom of the ice layer, and carves channels in the surface.

    The channels take on many forms. In the subimage shown here (figure 1) the gas from the dry ice has etched wide shallow channels. This region is relatively flat, which may be the reason these channels have a different morphology than the 'spiders' seen in more hummocky terrain.

    Observation Geometry Image PSP_003364_0945 was taken by the High Resolution Imaging Science Experiment (HiRISE) camera onboard the Mars Reconnaissance Orbiter spacecraft on 15-Apr-2007. The complete image is centered at -85.4 degrees latitude, 104.0 degrees East longitude. The range to the target site was 251.5 km (157.2 miles). At this distance the image scale is 25.2 cm/pixel (with 1 x 1 binning) so objects 75 cm across are resolved. The image shown here has been map-projected to 25 cm/pixel . The image was taken at a local Mars time of 06:57 PM and the scene is illuminated from the west with a solar incidence angle of 75 degrees, thus the sun was about 15 degrees above the horizon. At a solar longitude of 219.6 degrees, the season on Mars is Northern Autumn.

  12. Dry Ice Etches Terrain

    NASA Technical Reports Server (NTRS)

    2007-01-01

    [figure removed for brevity, see original site] Figure 1

    Every year seasonal carbon dioxide ice, known to us as 'dry ice,' covers the poles of Mars. In the south polar region this ice is translucent, allowing sunlight to pass through and warm the surface below. The ice then sublimes (evaporates) from the bottom of the ice layer, and carves channels in the surface.

    The channels take on many forms. In the subimage shown here (figure 1) the gas from the dry ice has etched wide shallow channels. This region is relatively flat, which may be the reason these channels have a different morphology than the 'spiders' seen in more hummocky terrain.

    Observation Geometry Image PSP_003364_0945 was taken by the High Resolution Imaging Science Experiment (HiRISE) camera onboard the Mars Reconnaissance Orbiter spacecraft on 15-Apr-2007. The complete image is centered at -85.4 degrees latitude, 104.0 degrees East longitude. The range to the target site was 251.5 km (157.2 miles). At this distance the image scale is 25.2 cm/pixel (with 1 x 1 binning) so objects 75 cm across are resolved. The image shown here has been map-projected to 25 cm/pixel . The image was taken at a local Mars time of 06:57 PM and the scene is illuminated from the west with a solar incidence angle of 75 degrees, thus the sun was about 15 degrees above the horizon. At a solar longitude of 219.6 degrees, the season on Mars is Northern Autumn.

  13. Refractive index-modified structures in glass written by 266nm fs laser pulses.

    PubMed

    Saliminia, Ali; Bérubé, Jean-Philippe; Vallée, Réal

    2012-12-03

    We demonstrate the inscription of embedded waveguides, anti-waveguides and Bragg gratings by use of intense femtosecond (fs) UV laser pulses at 266nm in pure fused silica, and for the first time, in bulk fused quartz and ZBLAN glasses. The magnitude of induced index changes, depends, besides pulse energy and translation speed, largely on writing depth and varies from ~10(-4) for smooth modifications to ~10(-3) for damaged structures. The obtained results are promising as they present the feasibility of fabrication of short (< 0.2μm) period first-order fiber Bragg gratings (FBGs) for applications such as in realization of all-fiber lasers operating at short wavelengths.

  14. The use of modified hill-climbing algorithm for laser beam focusing through the turbid medium

    NASA Astrophysics Data System (ADS)

    Galaktionov, Ilya; Kudryashov, Alexis; Sheldakova, Julia; Nikitin, Alexander

    2017-02-01

    We investigate the ability to focus the laser beam (λ=0.65μm) propagated through the scattering suspension of polystyrene microspheres in distilled water by means of bimorph deformable mirror. Shack-Hartmann sensor was used to measure the local slopes of the Poynting vector, while the CCD camera was used to measure the intensity of the focal spot in the farfield. Bimorph deformable mirror with 14 electrodes was applied in order to increase the intensity of the focal spot in the far-field. We investigated the efficiency of the laser beam focusing improvement by means of three techniques: LSQ fiterror minimization by Shack-Hartmann sensor, Hill-climbing optimization by Shack-Hartmann sensor and Hill-climbing optimization by far-field CCD camera.

  15. Effects of laser-modified polystyrene substrate on CHO cell growth and alignment.

    PubMed

    Zhu, Bangshang; Lu, Qinhua; Yin, Jie; Hu, Jun; Wang, Zongguang

    2004-07-15

    Biomaterial surface chemistry and nanoscale topography of biomaterials can significantly influence cell behavior in vitro. Polystyrene (PS) Petri dishes were subjected to Nd:YAG laser irradiation at 266 nm, which resulted in well-defined three-dimensional (3D) periodic nanoscale surface topographies and surface oxidation. The surface changes were analyzed by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and a contact-angle goniometer. The samples were then used to investigate the cell behavior of Chinese hamster ovary (CHO) cells. The surface laser modification affected the CHO cell adhesion and alignment, and caused morphological changes in comparison with unmodified PS. The results obtained from the cell-behavior studies revealed that nanoscale hydrophilic surface topography cues affected the adhesion, extension, alignment, and morphology of cells. Copyright 2004 Wiley Periodicals, Inc.

  16. Etching mechanism and morphology evolution in dry etching

    NASA Astrophysics Data System (ADS)

    Lee, Sang Ho

    III-V compound semiconductors (GaAs(100), GaP(100), InP(100), and GaN(0001)) and an insulator (amorphous SiO2) were etched, then their morphological dependencies on etch conditions were studied. All of them were etched in Cl 2/H2/Ar plasmas. Low energy electron enhanced etching (LE4) technique was mostly used to prevent surface and subsurface damage that may interfere with surface roughness. This technique exploits electrons from a DC plasma positive column instead of ion bombardment for the chemical reaction enhancement on sample surfaces. However, the effects of ion bombardment were also studied. The selection of bombarding species (electrons or ions) and energy of the bombarding species were controlled by biasing potentials for samples. In any case, the bias potential to sample surfaces was kept within a range of low energy during bombardment to prevent etch-induced damage which may affect the morphological evolution. The x-ray Triple Axis Diffractometer (TAD) was used to monitor structural damage after etching; energy dispersive x-ray spectroscopy (EDX), for chemical impurities or etch product residues. However, no structural damage nor residue was detected within the experimental conditions. Scanning electron microscopy (SEM) was used to observe surface morphologies; then, height variations over the surfaces were obtained using atomic force microscopy (AFM). The AFM data quantified statistical behavior (i.e. rms height variation, skewness, auto-covariance function, structure factor) of the surfaces. Such statistical behavior was linked with atomic mechanisms through scaling theory. This methodology revealed that quenched noise and thermochemical properties, which are highly dependent on temperature, govern surface morphologies for GaAs(100), GaP(100), and Inp(100). Although the nature of quenched noise is not well understood, this study shows that ridges in the mum range act as quenched noise. The quenched noise originates in nonuniform thermochemical

  17. Can the individual calibration be modified when laser fluorescence method is used for caries detection?

    PubMed

    Reyes, Alessandra; Ferreira, Gisele E; Santos, Joyce; Mendes, Fausto M; Imparato, Jose C P; Braga, Mariana M

    2013-03-01

    Individual calibration (IC) for caries detection methods based on fluorescence is time-consuming, especially for paediatric dentists, if the calibration has to be performed tooth-by-tooth. However, it is not clear how this calibration actually interfere in laser fluorescence (LF) readings. This in vivo study was to verify the influence of different modes of IC on laser fluorescence (LF) readings. Ninety six occlusal and 95 buccal surfaces of 1st permanent molars were examined using LF device after IC performed on control (no IC), the examined teeth, a permanent incisor, a 1st primary molar or a 2nd primary molar. All modes of IC were performed in the same child. Wilcoxon test and Bland-Altman analysis were used to compare the readings. Intraclass correlation coefficients (ICC) were calculated. Laser fluorescence readings without prior calibration were higher than readings performed after any mode of IC and resulted in different values of ICC. After other IC modes, the LF readings were statistically similar. The absence of IC influences LF readings and LF reproducibility, but different IC methods can be considered in clinical practice. © 2012 The Authors. International Journal of Paediatric Dentistry © 2012 BSPD, IAPD and Blackwell Publishing Ltd.

  18. Modifying the visual appearance of metal nanoparticle composites by infrared laser annealing

    NASA Astrophysics Data System (ADS)

    Halabica, Andrej; Indrobo, J. C.; Magruder, R. H., III; Haglund, R. F., Jr.; Epp, J. M.; Rashkeev, S.; Boatner, L. A.; Pennycook, S. J.; Pantelides, S. T.

    2007-03-01

    It has long been known that noble-metal nanoparticles in insulators can alter their visual appearance. Many metal nanoparticle composites can be created by ion implantation and subsequent annealing to initiate phase separation, nucleation and growth of nanoparticles. The size and size distribution of the nanoparticles - and therefore the color of the composite - are determined by the chemistry and thermodynamics of the annealing process. In this paper we report that we can also alter the color of gold- and silver-implanted silica and alumina by tunable infrared laser irradiation. Essentially a variant of rapid thermal annealing, this laser treatment can shift the plasmon band of the nanoparticles by tens of nm, resulting in significantly altered visual appearance. The amount of energy delivered to the implanted layer, and the subsequent color variation, can be adjusted by changing the wavelength and fluence of the laser. This makes it possible, as we will show, to write or pattern the composite material with 200 μm linewidths. This work is partially supported by DOE (DE-AC05-00OR22725), NSF (DMR-0513048), and by Alcoa Inc.

  19. Observing visible-range photoluminescence in GaAs nanowires modified by laser irradiation

    NASA Astrophysics Data System (ADS)

    Alekseev, P. A.; Dunaevskiy, M. S.; Kirilenko, D. A.; Smirnov, A. N.; Davydov, V. Yu.; Berkovits, V. L.

    2017-02-01

    We study the structural and chemical transformations induced by focused laser beam in GaAs nanowires with an axial zinc-blende/wurtzite (ZB/WZ) heterostructure. The experiments are performed using a combination of transmission electron microscopy, energy-dispersive X-ray spectroscopy, Raman scattering, and photoluminescence spectroscopy. For both the components of heterostructure, laser irradiation under atmospheric air is found to produce a double surface layer which is composed of crystalline arsenic and of amorphous GaOx. The latter compound is responsible for the appearance of a peak at 1.76 eV in photoluminescence spectra of GaAs nanowires. Under an increased laser power density, due to sample heating, evaporation of the surface crystalline arsenic and formation of β-Ga2O3 nanocrystals proceed on the surface of the zinc-blende part of nanowire. The formed nanocrystals reveal a photoluminescence band in a visible range of 1.7-2.4 eV. At the same power density for wurtzite part of the nanowire, total amorphization with the formation of β-Ga2O3 nanocrystals occurs. Observed transformation of WZ-GaAs to β-Ga2O3 nanocrystals presents an available way for the creation of axial and radial heterostructures ZB-GaAs/β-Ga2O3 for optoelectronic and photonic applications.

  20. Modifying proton fluence spectra to generate spread-out Bragg peaks with laser accelerated proton beams.

    PubMed

    Schell, S; Wilkens, J J

    2009-10-07

    Currently, energy spectra of laser accelerated proton beams are far from being monoenergetic. For their application in radiation therapy, energy selection systems using magnetic fields have been proposed to single out particles with the desired energy. These systems allow the choice of protons between a lowest and a highest energy. In this work, we present a slight modification that allows us to influence the relative number of particles per energy bin. In fact, the transmitted spectrum can be shaped in such a way that it corresponds to a full spread out Bragg peak delivered simultaneously. This change of the spectrum can be achieved by inserting suitably formed scattering material at the central plane of the energy selection system where the particles are separated in space depending on their energy. With the help of Monte Carlo simulations we analysed both simple wedge geometries and various stacks of lead slices. We found that these configurations can provide energy spectra that naturally produce spread out Bragg peaks within one laser shot. This increases the particle efficiency of the whole system and makes laser accelerated protons more suitable for radiation therapy.

  1. Etching of semiconductors and metals by the photonic jet with shaped optical fiber tips

    NASA Astrophysics Data System (ADS)

    Pierron, Robin; Lecler, Sylvain; Zelgowski, Julien; Pfeiffer, Pierre; Mermet, Frédéric; Fontaine, Joël

    2017-10-01

    The etching of semiconductors and metals by a photonic jet (PJ) generated with a shaped optical fiber tip is studied. Etched marks with a diameter of 1 μm have been realized on silicon, stainless steel and titanium with a 35 kHz pulsed laser, emitting 100 ns pulses at 1064 nm. The selection criteria of the fiber and its tip are discussed. We show that a 100/140 silica fiber is a good compromise which takes into account the injection, the working distance and the energy coupled in the higher-order modes. The energy balance is performed on the basis of the known ablation threshold of the material. Finally, the dependence between the etching depth and the number of pulses is studied. Saturation is observed probably due to a redeposition of the etched material, showing that a higher pulse energy is required for deeper etchings.

  2. Effects of etching and adhesive applications on the bond strength between composite resin and glass-ionomer cements

    PubMed Central

    PAMIR, Tijen; ŞEN, Bilge Hakan; EVCIN, Özgür

    2012-01-01

    Objective This study determined the effects of various surface treatment modalities on the bond strength of composite resins to glass-ionomer cements. Material and Methods Conventional (KetacTM Molar Quick ApplicapTM) or resin-modified (PhotacTM Fil Quick AplicapTM) glass-ionomer cements were prepared. Two-step etch-rinse & bond adhesive (AdperTM Single Bond 2) or single-step self-etching adhesive (AdperTM PromptTM L-PopTM) was applied to the set cements. In the etch-rinse & bond group, the sample surfaces were pre-treated as follows: (1) no etching, (2) 15 s of etching with 35% phosphoric acid, (3) 30 s of etching, and (4) 60 s of etching. Following the placement of the composite resin (FiltekTM Z250), the bond strength was measured in a universal testing machine and the data obtained were analyzed with the two-way analysis of variance (ANOVA) followed by the Tukey's HSD post hoc analysis (p=0.05). Then, the fractured surfaces were examined by scanning electron microscopy. Results The bond strength of the composite resin to the conventional glass-ionomer cement was significantly lower than that to the resin-modified glass-ionomer cement (p<0.001). No significant differences were determined between the self-etching and etch-rinse & bond adhesives at any etching time (p>0.05). However, a greater bond strength was obtained with 30 s of phosphoric acid application. Conclusions The resin-modified glass-ionomer cement improved the bond strength of the composite resin to the glass-ionomer cement. Both etch-rinse & bond and self-etching adhesives may be used effectively in the lamination of glass-ionomer cements. However, an etching time of at least 30 s appears to be optimal. PMID:23329245

  3. Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing

    NASA Astrophysics Data System (ADS)

    Shinoda, K.; Miyoshi, N.; Kobayashi, H.; Miura, M.; Kurihara, M.; Maeda, K.; Negishi, N.; Sonoda, Y.; Tanaka, M.; Yasui, N.; Izawa, M.; Ishii, Y.; Okuma, K.; Saldana, T.; Manos, J.; Ishikawa, K.; Hori, M.

    2017-05-01

    The demand for precisely controlled etching is increasing as semiconductor device geometries continue to shrink. To fulfill this demand, cyclic atomic level/layer etching will become one of the key technologies in semiconductor device manufacturing at nanometer dimensions. This review describes recent trends in semiconductor devices and some of the latest results on cyclic atomic-level etching. In particular, it focuses on two types of cyclic etching that use different heating procedures: infrared irradiation for isotropic etching and Ar+ ion bombardment for anisotropic etching. It describes how an inductively-coupled-plasma down-flow etching apparatus with infrared lamps can be used for isotropic cyclic etching. The isotropic cyclic etching of SiN involves the formation and thermal desorption of ammonium hexafluorosilicate-based surface modified layers. This method features high selectivity with respect to SiO2, atomic-level control of the amount of SiN etching, and isotropic etched features. On the other hand, the anisotropic cyclic etching with Ar+ ion bombardment uses a microwave electron-cyclotron-resonance plasma etching apparatus. The anisotropic process for poly Si is composed of cyclic repetitions of chlorine adsorption and Ar+ ion bombardment. The anisotropic process for SiN is composed of cyclic repetitions involving an adsorption step using hydrofluorocarbon chemistry and a desorption step using Ar+ ion bombardment. Potential applications of these isotropic/anisotropic cyclic etching processes are described.

  4. Thermoluminescent response of C-modified Al2O3 thin films deposited by parallel laser ablation plasmas

    NASA Astrophysics Data System (ADS)

    Garcés, J.; Escobar-Alarcón, L.; Gonzalez-Martinez, P. R.; Solís-Casados, D. A.; Romero, S.; Gonzalez-ZAvala, F.; Haro-Poniatowski, E.

    2017-01-01

    Aluminium oxide thin films modified with different amounts of carbon were prepared using a parallel laser ablation plasmas configuration. The effect of the amount of carbon incorporated in the films on their compositional, morphological, structural, and thermoluminescent properties was studied. The results showed that films with different C content, from 11 to 33 at. %, were obtained. The structural characterization revealed the growth of an amorphous material. Surface morphology of the obtained thin films showed smooth surfaces. The films were exposed to UV and gamma radiation (Co-60) in order to study their thermoluminescence response. The results tend to indicate that carbon incorporation into the alumina favours the increase of a high temperature TL peak.

  5. Promotion of protein crystal growth by actively switching crystal growth mode via femtosecond laser ablation

    NASA Astrophysics Data System (ADS)

    Tominaga, Yusuke; Maruyama, Mihoko; Yoshimura, Masashi; Koizumi, Haruhiko; Tachibana, Masaru; Sugiyama, Shigeru; Adachi, Hiroaki; Tsukamoto, Katsuo; Matsumura, Hiroyoshi; Takano, Kazufumi; Murakami, Satoshi; Inoue, Tsuyoshi; Yoshikawa, Hiroshi Y.; Mori, Yusuke

    2016-11-01

    Large single crystals with desirable shapes are essential for various scientific and industrial fields, such as X-ray/neutron crystallography and crystalline devices. However, in the case of proteins the production of such crystals is particularly challenging, despite the efforts devoted to optimization of the environmental, chemical and physical parameters. Here we report an innovative approach for promoting the growth of protein crystals by directly modifying the local crystal structure via femtosecond laser ablation. We demonstrate that protein crystals with surfaces that are locally etched (several micrometers in diameter) by femtosecond laser ablation show enhanced growth rates without losing crystal quality. Optical phase-sensitive microscopy and X-ray topography imaging techniques reveal that the local etching induces spiral growth, which is energetically advantageous compared with the spontaneous two-dimensional nucleation growth mode. These findings prove that femtosecond laser ablation can actively switch the crystal growth mode, offering flexible control over the size and shape of protein crystals.

  6. Preparation of nanostructured Bi-modified TiO2 thin films by crossed-beam laser ablation plasmas

    NASA Astrophysics Data System (ADS)

    Escobar-Alarcon, L.; Solís-Casados, D. A.; González-Zavala, F.; Romero, S.; Fernandez, M.; Haro-Poniatowski, E.

    2017-01-01

    The preparation and characterization of titanium dioxide thin films modified with different amounts of bismuth using a two laser ablation plasmas configuration is reported. The plasmas were produced ablating simultaneously two different targets, one of bismuth and other of titanium dioxide, using a Nd:YAG laser with emission in the fundamental line. The elemental composition, together with the vibrational and optical properties of the deposited films were investigated as a function of the parameters of the bismuth plasma. The composition of the thin films was determined from measurements of X-ray photoelectron spectroscopy (XPS) as well as by Rutherford backscattering spectroscopy (RBS). The structural modification of the deposited material, due to the incorporation of Bi, was characterized by Raman spectroscopy. The optical properties were determined from UV-Vis spectroscopy measurements. It is found that bismuth incorporation has an important effect on the optical properties of TiO2 narrowing the band gap from 3.2 to 2.5 eV.

  7. Comparative Evaluation of the Etching Pattern of Er,Cr:YSGG & Acid Etching on Extracted Human Teeth-An ESEM Analysis

    PubMed Central

    Mazumdar, Dibyendu; Ranjan, Shashi; Krishna, Naveen Kumar; Kole, Ravindra; Singh, Priyankar; Lakiang, Deirimika; Jayam, Chiranjeevi

    2016-01-01

    Introduction Etching of enamel and dentin surfaces increases the surface area of the substrate for better bonding of the tooth colored restorative materials. Acid etching is the most commonly used method. Recently, hard tissue lasers have been used for this purpose. Aim The aim of the present study was to evaluate and compare the etching pattern of Er,Cr:YSGG and conventional etching on extracted human enamel and dentin specimens. Materials and Methods Total 40 extracted non-diseased teeth were selected, 20 anterior and 20 posterior teeth each for enamel and dentin specimens respectively. The sectioned samples were polished by 400 grit Silicon Carbide (SiC) paper to a thickness of 1.0 ± 0.5 mm. The enamel and dentin specimens were grouped as: GrE1 & GrD1 as control specimens, GrE2 & GrD2 were acid etched and GrE3 & GrD3 were lased. Acid etching was done using Conditioner 36 (37 % phosphoric acid) according to manufacturer instructions. Laser etching was done using Er,Cr:YSGG (Erbium, Chromium : Ytrium Scandium Gallium Garnet) at power settings of 3W, air 70% and water 20%. After surface treatment with assigned agents the specimens were analyzed under ESEM (Environmental Scanning Electron Microscope) at X1000 and X5000 magnification. Results Chi Square and Student “t” statistical analysis was used to compare smear layer removal and etching patterns between GrE2-GrE3. GrD2 and GrD3 were compared for smear layer removal and diameter of dentinal tubule opening using the same statistical analysis. Chi-square test for removal of smear layer in any of the treated surfaces i.e., GrE2-E3 and GrD2-D3 did not differ significantly (p>0.05). While GrE2 showed predominantly type I etching pattern (Chi-square=2.78, 0.05

    0.10) and GrE3 showed type III etching (Chi-square=4.50, p<0.05). The tubule diameters were measured using GSA (Gesellschaft fur Softwareentwicklung und Analytik, Germany) image analyzer and the ‘t’ value of student ‘t’ test was 18.10 which was a

  8. The thermal damage process of the contaminated optical element used in high energy laser system

    NASA Astrophysics Data System (ADS)

    Han, Kai; Song, Rui; Xu, Xiaojun

    2017-05-01

    Fused silica optics were treated by dynamic etching using buffered hydrofluoric acid (BHF) with different etching depths. The transmissivity of fused silica slightly increases in deep UV (DUV) range after dynamic etching. Surface qualities of fused silica were characterized in terms of surface roughness, surface profile and photoluminescence (PL) spectra. The results show that dynamic etching has a slight impact on surface RMS roughness.PL defects gradually reduces by dynamic etching, and laser damage resistance of fused silica continuously increases with etching depth extending. When removal depth increases to 12μm, the damage threshold is the double that of the unetched surface. However, surface profile continuously deteriorates with etching depth increasing. Appropriate etching amount is very important for improving damage resistance and mitigating surface profile deteriorating of fused silica during etching process simultaneously. The study is expected to contribute to the practical application of dynamic etching for mitigating laser induced degradation of fused silica optics under UV laser irradiation.

  9. Precision Laser Annealing of Focal Plane Arrays

    SciTech Connect

    Bender, Daniel A.; DeRose, Christopher; Starbuck, Andrew Lea; Verley, Jason C.; Jenkins, Mark W.

    2015-09-01

    We present results from laser annealing experiments in Si using a passively Q-switched Nd:YAG microlaser. Exposure with laser at fluence values above the damage threshold of commercially available photodiodes results in electrical damage (as measured by an increase in photodiode dark current). We show that increasing the laser fluence to values in excess of the damage threshold can result in annealing of a damage site and a reduction in detector dark current by as much as 100x in some cases. A still further increase in fluence results in irreparable damage. Thus we demonstrate the presence of a laser annealing window over which performance of damaged detectors can be at least partially reconstituted. Moreover dark current reduction is observed over the entire operating range of the diode indicating that device performance has been improved for all values of reverse bias voltage. Additionally, we will present results of laser annealing in Si waveguides. By exposing a small (<10 um) length of a Si waveguide to an annealing laser pulse, the longitudinal phase of light acquired in propagating through the waveguide can be modified with high precision, <15 milliradian per laser pulse. Phase tuning by 180 degrees is exhibited with multiple exposures to one arm of a Mach-Zehnder interferometer at fluence values below the morphological damage threshold of an etched Si waveguide. No reduction in optical transmission at 1550 nm was found after 220 annealing laser shots. Modeling results for laser annealing in Si are also presented.

  10. Regenerative Electroless Etching of Silicon.

    PubMed

    Kolasinski, Kurt W; Gimbar, Nathan J; Yu, Haibo; Aindow, Mark; Mäkilä, Ermei; Salonen, Jarno

    2017-01-09

    Regenerative electroless etching (ReEtching), described herein for the first time, is a method of producing nanostructured semiconductors in which an oxidant (Ox1 ) is used as a catalytic agent to facilitate the reaction between a semiconductor and a second oxidant (Ox2 ) that would be unreactive in the primary reaction. Ox2 is used to regenerate Ox1 , which is capable of initiating etching by injecting holes into the semiconductor valence band. Therefore, the extent of reaction is controlled by the amount of Ox2 added, and the rate of reaction is controlled by the injection rate of Ox2 . This general strategy is demonstrated specifically for the production of highly luminescent, nanocrystalline porous Si from the reaction of V2 O5 in HF(aq) as Ox1 and H2 O2 (aq) as Ox2 with Si powder and wafers.

  11. Effect of oxygen plasma etching on graphene’s mechanical and electrical properties

    NASA Astrophysics Data System (ADS)

    Jia, Pengfei; Pan, Fengming; Chen, Tianhang

    2017-03-01

    This paper reports a study of the effect of oxygen plasma etching on the mechanical and electrical properties of chemical vapor deposited (CVD) multilayer graphene. By means of scan probe microscopy (SPM), it was found that the defects were initially induced to the top graphene layer by oxygen plasma etching, which plays an incentive role in further etching. Oxygen plasma bombarding on surface of graphene enhanced the surface roughness, as well changed the tribological properties. The results of electronic transport measurements show a decrease in mobility with the increase of etching duration. These findings are valuable for studying the effects of plasma etching on graphene, and modifying the physical properties of graphene through artificially generated defects.

  12. Lithium Niobate Reactive Ion Etching

    DTIC Science & Technology

    2000-07-01

    sputter method. The coated substrates were then patterned using a photolithographic mask with AZP 4620 photoresist. The NiCr layer was sputter etched to...create the NiCr RIE mask and the photoresist residual removed. Sputter etch was the chosen technology to pattern the NiCr for two main reasons; - An...2. Experimental Description 2.1 Preparation of Lithium Niobate Samples The LiNbO3 substrates were coated with a 3000 A layer of NiCr using the RF

  13. Two-year clinical trial of a universal adhesive in total-etch and self-etch mode in non-carious cervical lesions.

    PubMed

    Lawson, Nathaniel C; Robles, Augusto; Fu, Chin-Chuan; Lin, Chee Paul; Sawlani, Kanchan; Burgess, John O

    2015-10-01

    To compare the clinical performance of Scotchbond™ Universal Adhesive used in self- and total-etch modes and two-bottle Scotchbond™ Multi-purpose Adhesive in total-etch mode for Class 5 non-carious cervical lesions (NCCLs). 37 adults were recruited with 3 or 6 NCCLs (>1.5mm deep). Teeth were isolated, and a short cervical bevel was prepared. Teeth were restored randomly with Scotchbond Universal total-etch, Scotchbond Universal self-etch or Scotchbond Multi-purpose followed with a composite resin. Restorations were evaluated at baseline, 6, 12 and 24 months for marginal adaptation, marginal discoloration, secondary caries, and sensitivity to cold using modified USPHS Criteria. Patients and evaluators were blinded. Logistic and linear regression models using a generalized estimating equation were applied to evaluate the effects of time and adhesive material on clinical assessment outcomes over the 24 month follow-up period. Kaplan-Meier method was used to compare the retention between adhesive materials. Clinical performance of all adhesive materials deteriorated over time for marginal adaptation, and discoloration (p<0.0001). Both Scotchbond Universal self-etch and Scotchbond Multi-purpose materials were more than three times as likely to contribute to less satisfying performance in marginal discoloration over time than Scotchbond Universal total-etch. The retention rates up to 24 months were 87.6%, 94.9% and 100% for Scotchbond Multi-purpose and Scotchbond Universal self-etch and total-etch, respectively. Scotchbond Universal in self- and total- etch modes performed similar to or better than Scotchbond Multipurpose, respectively. 24 month evaluation of a universal adhesive indicates acceptable clinical performance, particularly in a total-etch mode. Copyright © 2015 Elsevier Ltd. All rights reserved.

  14. Two-year clinical trial of a universal adhesive in total-etch and self-etch mode in non-carious cervical lesions☆

    PubMed Central

    Lawson, Nathaniel C.; Robles, Augusto; Fu, Chin-Chuan; Lin, Chee Paul; Sawlani, Kanchan; Burgess, John O.

    2016-01-01

    Objectives To compare the clinical performance of Scotchbond™ Universal Adhesive used in self- and total-etch modes and two-bottle Scotchbond™ Multi-purpose Adhesive in total-etch mode for Class 5 non-carious cervical lesions (NCCLs). Methods 37 adults were recruited with 3 or 6 NCCLs (>1.5 mm deep). Teeth were isolated, and a short cervical bevel was prepared. Teeth were restored randomly with Scotchbond Universal total-etch, Scotchbond Universal self-etch or Scotchbond Multi-purpose followed with a composite resin. Restorations were evaluated at baseline, 6, 12 and 24 months for marginal adaptation, marginal discoloration, secondary caries, and sensitivity to cold using modified USPHS Criteria. Patients and evaluators were blinded. Logistic and linear regression models using a generalized estimating equation were applied to evaluate the effects of time and adhesive material on clinical assessment outcomes over the 24 month follow-up period. Kaplan–Meier method was used to compare the retention between adhesive materials. Results Clinical performance of all adhesive materials deteriorated over time for marginal adaptation, and discoloration (p <0.0001). Both Scotchbond Universal self-etch and Scotchbond Multi-purpose materials were more than three times as likely to contribute to less satisfying performance in marginal discoloration over time than Scotchbond Universal total-etch. The retention rates up to 24 months were 87.6%, 94.9% and 100% for Scotchbond Multi-purpose and Scotchbond Universal self-etch and total-etch, respectively. Conclusions Scotchbond Universal in self- and total- etch modes performed similar to or better than Scotchbond Multipurpose, respectively. Clinical significance 24 month evaluation of a universal adhesive indicates acceptable clinical performance, particularly in a total-etch mode. PMID:26231300

  15. Spotlight on lasers. A look at potential benefits

    SciTech Connect

    Zakariasen, K.L.; MacDonald, R.; Boran, T. )

    1991-07-01

    Before lasers can be highly integrated into clinical practice, further research must prove the efficacy, efficiency, consistency and safety of this new technology. Currently, increased caries prevention and rapid laser etching are two potential benefits of laser technology.

  16. Sputter-Etching Characteristics of BST and SBT using a Surface-Wave High-Density Plasma Reactor.

    NASA Astrophysics Data System (ADS)

    Stafford, L.; Margot, J.; Delprat, S.; Chaker, M.; Queney, D.

    2001-10-01

    In the context of the integration of ferroelectric capacitors such as FeRAMs and DRAMs, the dry etching of pulse laser deposited barium-strontium-titanate (BST) and bismuth-strontium-tantalate (SBT) is investigated using a non-reactive surface-wave high-density argon magnetoplasma. The etching characteristics of rf-biased thin films are evaluated as a function of the self-bias voltage, the magnetic field intensity and the gas pressure. It is found that high etch rates with a good selectivity over resist can be achieved without any plasma chemistry provided the plasma is operated in the mtorr regime. For BST, etch rates as high as 1000 Åmin with a selectivity of 0.6 over HPR504 photoresist are obtained for self-bias voltages lower than 150 V. Both BST and SBT present similar sputter-etching characteristics, SBT being however etched faster then BST.

  17. 12P-conjugated PEG-modified gold nanorods combined with near-infrared laser for tumor targeting and photothermal therapy.

    PubMed

    Zhan, Tao; Li, Pengfei; Bi, Shan; Dong, Biao; Song, Hongwei; Ren, Hui; Wang, Liping

    2012-09-01

    Gold nanorods have been reported as potential tumor photothermal therapy in vivo and in vitro. However, development of the safe and efficient tumor-targeting gold nanorods for in vivo localized tumor therapy is still a challenge. In our present study, we synthesized the PEG modified gold nanorods and demonstrated its negligible cytotoxicity in vitro. These nanorods also have been demonstrated to efficiently ablate the different kinds of tumor cells in vitro after exposure to the near-infrared laser. When the PEG modified gold nanorods conjugated with the 12P (sequence: TACHQHVRMVRP), this conjugate showed great tumor-targeting and hyperthermia effects on the human liver cancer cell line HepG2 in vitro when coupled with the near-infrared laser treatment. To determine the potential hyperthermia effect of PEG modified gold nanorods or 12P conjugate on tumor cells in vivo, the mice hepatic cancer cells were used to induce the subcutaneous tumor-bearing model in ICR mice. The significant inhibition effects of near-infrared laser mediated PEG modified gold nanorods or 12P conjugate on the tumor growth were observed. These composite results suggest that the 12P-conjugated PEG modified gold nanorods exhibit great biocompatible, particular tumor-targeting and effective photothermal ablation of tumor cells, which warrant the potential therapeutic value of this conjugate for further application in in vivo localized tumor therapy.

  18. Plasma Etching Improves Solar Cells

    NASA Technical Reports Server (NTRS)

    Bunyan, S. M.

    1982-01-01

    Etching front surfaces of screen-printed silicon photovoltaic cells with sulfur hexafluoride plasma found to increase cell performance while maintaining integrity of screen-printed silver contacts. Replacement of evaporated-metal contacts with screen-printed metal contacts proposed as one way to reduce cost of solar cells for terrestrial applications.

  19. Geomorphic and Spectral Mapping of Meridiani Planum Eastern Etched Terrain

    NASA Astrophysics Data System (ADS)

    Griffes, J. L.; Arvidson, R. E.; Bibring, J.; Poulet, F.

    2004-12-01

    Mars Orbiter Camera (MOC), Mars Orbiter Laser Altimeter (MOLA), Thermal Emission Imaging System (THEMIS), and Mars Express (OMEGA) data were compiled and coregistered for analysis of exposures of etched terrain materials in the eastern portion of Meridiani Planum (latitude: -2.5° to 5° N, longitude: 0° to 8° E). The etched terrain in this region is a useful analog to the terrain underlying the hematite-bearing deposits at the Opportunity landing site. Etched materials in the study area are exposed in a NE-SW trending basin approximately 400 meters deep, 185 kilometers wide, and 315 kilometers long. We have mapped a stack (200 meters thick) of layered deposits which unconformably overlie the Noachian dissected cratered terrain. The surfaces range morphologically from smooth plains, patterned ground, and plains cut by interconnected ridges. Further, the units have distinct spectral signatures in OMEGA hyperspectral data (0.35 to 5.1 μ m) acquired on orbit 485. Detailed morphologic and mineralogic maps for the eastern etched terrain will be presented and discussed.

  20. Semiconductor etching by hyperthermal neutral beams

    NASA Technical Reports Server (NTRS)

    Minton, Timothy K. (Inventor); Giapis, Konstantinos P. (Inventor)

    1999-01-01

    An at-least dual chamber apparatus and method in which high flux beams of fast moving neutral reactive species are created, collimated and used to etch semiconductor or metal materials from the surface of a workpiece. Beams including halogen atoms are preferably used to achieve anisotropic etching with good selectivity at satisfactory etch rates. Surface damage and undercutting are minimized.

  1. Methods for dry etching semiconductor devices

    SciTech Connect

    Bauer, Todd; Gross, Andrew John; Clews, Peggy J.; Olsson, Roy H.

    2016-11-01

    The present invention provides methods for etching semiconductor devices, such aluminum nitride resonators. The methods herein allow for devices having improved etch profiles, such that nearly vertical sidewalls can be obtained. In some examples, the method employs a dry etch step with a primary etchant gas that omits BCl.sub.3, a common additive.

  2. Laser labeling, a safe technology to label produce

    USDA-ARS?s Scientific Manuscript database

    Laser labeling of fruits and vegetables is an alternative means to label produce. Low energy CO2 laser beams etch the surface showing the contrasting underlying layer. These etched surfaces can promote water loss and potentially allow for entry of decay organisms. The long-term effects of laser labe...

  3. [Six-o'clock tunnel holmium laser enucleation of the prostate: a modified procedure for benign prostate hyperplasia].

    PubMed

    Gu, Mieng; Cai, Zhi-kang; Chen, Qi; Chen, Yan-bo; Wang, Zhong

    2015-02-01

    To evaluate the safety and effectiveness of a modified method of holmium laser enucleation of the prostate (HoLEP)--6-o'clock tunnel HoLEP for the treatment of benign prostate hyperplasia (BPH). We included 112 cases of BPH in this study, 57 treated by 6-o'clock tunnel HoLEP (experimental group) and the other 55 by conventional HoLEP (control group). We compared the operation time, volume of the resected prostatic tissue, intraoperative blood transfusion, volume of bladder irrigation solution, postoperative hemoglobin change, and incidence of urinary incontinence between the two groups. Statistically significant differences were observed between the experimental and control groups in the operation time ([56.01 ± 8.62] min vs [68.65 ± 9.08] min), cases of intraoperative blood transfusion (0 vs 2), volume of bladder irrigation solution ([27.51 ± 3.67] L vs [36.89 ± 6.47] L), postoperative hemoglobin decrease ([10.70 ± 2.50] g/L vs [12.60 ± 3.30] g/L), and cases of postoperative stress-induced urinary incontinence (2 vs 7) (all P <0.05). One-month follow-up revealed smooth urination in both groups of patients but no true urinary incontinence or secondary bleeding in either. Modified 6-o'clock tunnel HoLEP can significantly reduce the operation time, bladder irrigation, and intraoperative bleeding, and therefore can be used as a safe and effective option for the treatment of BPH.

  4. Etching of GaN layers at electrolysis under UV-irradiation

    NASA Astrophysics Data System (ADS)

    Zubenko, T. K.; Puzyk, M. V.; Stozharov, V. M.; Ermakov, I. A.; Kovalev, D. S.; Ivanova, S. A.; Usikov, A. S.; Medvedev, O. S.; Papchenko, B. P.; Kurin, S. Yu; Antipov, A. A.; Chernyakov, A. E.

    2016-08-01

    Etching of the GaN layers in 1M KOH aqua solution under irradiation was studied by the electro-stimulated photolysis using N2-laser (337 nm, 60 W/m2) as a light source. It was observed that the size and the depth of the failure monotonically depend on the optical power and the irradiation time of the N2 laser and the GaN layer type of conductivity. The GaN layers etching rate was evaluated. A mechanism of the failure in the n-GaN layers is discussed.

  5. Derivatization, stabilization and detection of biogenic amines by cyclodextrin-modified capillary electrophoresis-laser-induced fluorescence detection.

    PubMed

    Male, K B; Luong, J H

    2001-08-17

    o-Phthalaldehyde (OPA) derivatives of eight biogenic amines were stabilized at 5 degrees C by forming inclusion complexes with methyl-beta-cyclodextrin (MBCD). The derivatives were separated and detected by cyclodextrin-modified capillary electrophoresis (CE) with UV or laser-induced fluorescence (LIF) detection. Using a borate buffer, pH 9.0 consisting of ethanol and a mixture of negatively charged sulfobutylether-beta-cyclodextrin and neutral MBCD, baseline separation of the eight OPA derivatives was achieved within 25 min with high separation efficiencies. The detection limits (S/N=3) obtained by UV and LIF detection were determined to be 10 microM and 0.250 microM, respectively. Glutamic acid was added after the initial derivatization step to neutralize residual OPA which otherwise caused a significant interference, particularly when analysis was performed around the detection limit of the OPA derivatives. Important biogenic amines in fish, wine and urine were then derivatized and determined by CE-LIF. In the case of sole and rainbow trout, the results obtained were validated by an enzymatic assay using putrescine oxidase.

  6. Selective Si Etching Using HCl Vapor

    NASA Astrophysics Data System (ADS)

    Isheden, C.; Hellström, P. E.; Radamson, H. H.; Zhang, S.-L.; Östling, M.

    2004-01-01

    Selective Si etching using HCl in a reduced pressure chemical vapor deposition reactor in the temperature range 800 1000°C is investigated. At 900°C, the etch process is anisotropic, exhibiting the densely packed (100), (311) and (111) surfaces. This behavior indicates that the etch process is limited by surface reaction, since the etch rate in the directions with higher atomic concentration is lower. When the temperature is decreased to 800°C, etch pits occur. A more isotropic etch is obtained at 1000°C, however at this temperature the masking oxide is attacked and the etch surface is rough. Thus the temperature has to be under the present process conditions, confined to a narrow window to yield desirable properties.

  7. Ion-beam-assisted etching of diamond

    NASA Technical Reports Server (NTRS)

    Efremow, N. N.; Geis, M. W.; Flanders, D. C.; Lincoln, G. A.; Economou, N. P.

    1985-01-01

    The high thermal conductivity, low RF loss, and inertness of diamond make it useful in traveling wave tubes operating in excess of 500 GHz. Such use requires the controlled etching of type IIA diamond to produce grating like structures tens of micrometers deep. Previous work on reactive ion etching with O2 gave etching rates on the order of 20 nm/min and poor etch selectivity between the masking material (Ni or Cr) and the diamond. An alternative approach which uses a Xe(+) beam and a reactive gas flux of NO2 in an ion-beam-assisted etching system is reported. An etching rate of 200 nm/min was obtained with an etching rate ratio of 20 between the diamond and an aluminum mask.

  8. Effects of etching time on alpha tracks in solid state nuclear track detectors.

    PubMed

    Gillmore, Gavin; Wertheim, David; Crust, Simon

    2017-01-01

    Solid State Nuclear Track Detectors (SSNTDs) are used extensively for monitoring alpha particle radiation, neutron flux and cosmic ray radiation. Radon gas inhalation is regarded as being a significant contributory factor to lung cancer deaths in the UK each year. Gas concentrations are often monitored using CR39 based SSNTDs as the natural decay of radon results in alpha particles which form tracks in these detectors. Such tracks are normally etched for about 4h to enable microscopic analysis. This study examined the effect of etching time on the appearance of alpha tracks in SSNTDs by collecting 2D and 3D image datasets using laser confocal microscope imaging techniques. Etching times of 2 to 4h were compared and marked differences were noted in resultant track area. The median equivalent diameters of tracks were 20.2, 30.2 and 38.9μm for etching at 2, 3 and 4h respectively. Our results indicate that modern microscope imaging can detect and image the smaller size tracks seen for example at 3h etching time. Shorter etching times may give rise to fewer coalescing tracks although there is a balance to consider as smaller track sizes may be more difficult to image. Thus etching for periods of less than 4h clearly merits further investigation as this approach has the potential to improve accuracy in assessing the number of tracks. Copyright © 2016 Elsevier B.V. All rights reserved.

  9. Light wave interference during laser drilling of polymer coatings

    NASA Astrophysics Data System (ADS)

    Pargellis, A. N.; Au, D. T. W.; Kestenbaum, A.

    1988-12-01

    A CO2 laser has been used to drill holes in a 150-μm-thick, UV-curable, modified acrylate, polymer coating a copper substrate. A typical hole is 100-150 μm in diameter. The holes in this study were each made with a single laser pulse of 10.6-μm wavelength, duration 100 or 200 μs, and 4-20 mJ energy. Two superimposed sets of periodic ripples have been observed on the hole walls. The shorter wavelength varies from 4.0 μm at the top of the hole to 5.3 μm at the bottom of the hole. The longer wavelength appears to be 13.2 μm and is attenuated as the wave propagates towards the copper substrate. The experimental data are compared with values calculated using a model that considers the interference of a standing wave inside the hole with radiation propagating through the dielectric surrounding the hole. The amplitude (trough-to-peak distance) of the waves in the hole wall is about half the wavelength of the standing waves. The long-wavelength waves (13.2 μm) yield ripples in the wall of 6.5-μm amplitude. These ripples give 13.0 μm (0.5 mils) as an ultimate lower limit for laser drilling holes using the 10.6-μm wavelengths obtained with a CO2 laser. Chemical etching of the polymer causes all of the holes to have thin rims surrounding the top of the hole. This is due to accelerated etching of the less cured polymer material inside the hole. A chemical etching process etches away some of the ripple pattern, particularly near the top of the hole.

  10. Galvanic etching for sensor fabrication

    NASA Astrophysics Data System (ADS)

    Ashruf, C. M. A.; French, P. J.; Sarro, P. M.; Kazinczi, R.; Xia, X. H.; Kelly, J. J.

    2000-12-01

    This paper describes the application of a novel etch-stop technique, based on galvanic element formation, to the fabrication of micromechanical sensors. The theory of operation in tetramethyl ammonium hydroxide (TMAH) and hydrofluoric acid (HF) solutions is discussed, together with the main limitations. A number of devices are presented. These include a piezoresistive pressure sensor made with a galvanic etch stop in a 25% TMAH solution at 80 °C and the contactless fabrication in similar solutions of a vibration sensor based on free-standing crystalline silicon beams. The thickness definition and uniformity were found to be poorer with the cantilever than with the membrane type sensors. Oxygen in the solution was used to provide the cell current, which was therefore rather low. This resulted in a low package density of the sensor elements on the wafer. Free-standing thick polysilicon structures were also formed with a galvanic etch-stop technique in HF solutions. The selectivity of this process, and the thickness definition and uniformity were good. In these solutions, the cell current could be easily increased by adding other strong oxidizing agents, such as hydrogen peroxide. Therefore, high package densities could be achieved in these solutions.

  11. The modified SRRS threshold criteria for high peak power laser pulses in long air-path transmission considering the near-field beam quality

    NASA Astrophysics Data System (ADS)

    Zhu, C. Y.; Lin, D. Y.; Lu, Z. W.; Wang, Y. X.; Wang, Z.; Liang, L. X.; Ba, D. X.

    2016-11-01

    This paper demonstrates that the stimulated rotational Raman scattering (SRRS) threshold for high peak power laser pulses propagating through a long air path can be influenced strongly by the near-field quality of the laser beams, and the relationship between the SRRS threshold and the near-field beam quality (i.e., spatial intensity modulation index and contrast ratio) can be evaluated quantitatively. By using our three-dimensional numerical model, which can describe the spatial-temporal evolution behaviors of SRRS and is verified by previously published SRRS experimental data, the criteria of the safe transmission distance for high peak power nanosecond laser pulses are obtained, and the modified SRRS threshold criterion formulas considering the near-field beam conditions are presented.

  12. AAPSM repair utilizing transparent etch stop layer

    NASA Astrophysics Data System (ADS)

    Taylor, Darren; Cangemi, Michael; Lassiter, Matthew; Cangemi, Marc; Poortinga, Eric

    2004-12-01

    Repair of etched quartz defects on AAPSM products negatively affect manufacturability in the mask shop. Currently there are few solutions to repair etched quartz defects, two of these include mechanical removal or a combination of topography mapping and FIB milling of the defect. Both of the above methods involve large capital investments specifically for etched quartz repair. The method presented in this study readily repairs etched quartz without the need to purchase additional tools for AAPSM repair. Photronics' Advanced Materials Program has developed a transparent etch stop layer (TESL) integrated into the binary blank for the purpose of building AAPSM products with a high yield component. This etch stop layer is located under a layer of sputtered SiO2 deposited to 180° for a given lithography wavelength. These blanks can be used for a variety of etched quartz applications including cPSM and CPL. Photronics has developed software that reads in defect locations from automatic inspection tools and the jobdeck. A "repair" layer is created for the defect file and the plate is then re-exposed on the mask lithography tool. The defects are then etched away using the etch stop to control the phase of the surrounding trench. The repair method was tested using programmed defect masks from single etched 193nm AAPSM technologies. Inspection, SEM, AIMS and profilometry results will be shown.

  13. In-Plasma Photo-Assisted Etching

    NASA Astrophysics Data System (ADS)

    Economou, Demetre

    2015-09-01

    A methodology to precisely control the ion energy distribution (IED) on a substrate allowed the study of silicon etching as a function of ion energy at near-threshold energies. Surprisingly, a substantial etching rate was observed, independent of ion energy, when the ion energy was below the ion-assisted etching threshold (~ 16 eV for etching silicon with chlorine plasma). Careful experiments led to the conclusion that this ``sub-threshold'' etching was due to photons, predominately at wavelengths <1700 Å. Among the plasmas investigated, photo-assisted etching (PAE) was lowest in Br2/Ar gas mixtures and highest in HBr/Cl2/Ar. Above threshold etching rates scaled with the square root of ion energy. PAE rates scaled with the product of surface halogen coverage (measured by X-ray photoelectron spectroscopy) and Ar emission intensity (7504 Å). Scanning electron and atomic force microscopy (SEM and AFM) revealed that photo-etched surfaces were very rough, quite likely due to the inability of the photo-assisted process to remove contaminants from the surface. In-plasma PAE may be be a complicating factor for processes that require low ion energies, such as atomic layer etching. On the other hand PAE could produce sub-10 nm high aspect ratio (6:1) features by highly selective plasma etching to transfer nascent nanopatterns in silicon. Work supported by DOE Plasma Science Center and NSF.

  14. Understanding and controlling the step bunching instability in aqueous silicon etching

    NASA Astrophysics Data System (ADS)

    Bao, Hailing

    Chemical etching of silicon has been widely used for more than half a century in the semiconductor industry. It not only forms the basis for current wafer cleaning processes, it also serves as a powerful tool to create a variety of surface morphologies for different applications. Its potential for controlling surface morphology at the atomic scale over micron-size regions is especially appealing. In spite of its wide usage, the chemistry of silicon etching is poorly understood. Many seemingly simple but fundamental questions have not been answered. As a result, the development of new etchants and new etching protocols are based on expensive and tedious trial-and-error experiments. A better understanding of the etching mechanism would direct the rational formulation of new etchants that produce controlled etch morphologies. Particularly, micron-scale step bunches spontaneously develop on the vicinal Si(111) surface etched in KOH or other anisotropic aqueous etchants. The ability to control the size, orientation, density and regularity of these surface features would greatly improve the performance of microelectromechanical devices. This study is directed towards understanding the chemistry and step bunching instability in aqueous anisotropic etching of silicon through a combination of experimental techniques and theoretical simulations. To reveal the cause of step-bunching instability, kinetic Monte Carlo simulations were constructed based on an atomistic model of the silicon lattice and a modified kinematic wave theory. The simulations showed that inhomogeneity was the origin of step-bunching, which was confirmed through STM studies of etch morphologies created under controlled flow conditions. To quantify the size of the inhomogeneities in different etchants and to clarify their effects, a five-parallel-trench pattern was fabricated. This pattern used a nitride mask to protect most regions of the wafer; five evenly spaced etch windows were opened to the Si(110

  15. Sensitivity Enhancement of RF Plasma Etch Endpoint Detection With K-means Cluster Analysis

    NASA Astrophysics Data System (ADS)

    Lee, Honyoung; Jang, Haegyu; Lee, Hak-Seung; Chae, Heeyeop

    2015-09-01

    Plasma etching process is the core process in semiconductor fabrication, and the etching endpoint detection is one of the essential FDC (Fault Detection and Classification) for yield management and mass production. In general, Optical emission spectrocopy (OES) has been used to detect endpoint because OES can be a non-invasive and real-time plasma monitoring tool. In OES, the trend of a few sensitive wavelengths is traced. However, in case of small-open area etch endpoint detection (ex. contact etch), it is at the boundary of the detection limit because of weak signal intensities of reaction reactants and products. Furthemore, the various materials covering the wafer such as photoresist, dielectric materials, and metals make the analysis of OES signals complicated. In this study, full spectra of optical emission signals were collected and the data were analyzed by a data-mining approach, modified K-means cluster analysis. The K-means cluster analysis is modified suitably to analyze a thousand of wavelength variables from OES. This technique can improve the sensitivity of EPD for small area oxide layer etching processes: about 1.0% oxide area. This technique is expected to be applied to various plasma monitoring applications including fault detections as well as EPD. Plasma Etch, EPD, K-means Cluster Analysis.

  16. SF6 plasma etching of silicon nanocrystals.

    PubMed

    Liptak, R W; Devetter, B; Thomas, J H; Kortshagen, U; Campbell, S A

    2009-01-21

    An SF(6)-based plasma has been employed to perform in-flight etching of silicon nanocrystals (Si-NCs) after they were synthesized in an SiH(4)-based plasma. The photoluminescence of the Si-NCs blue-shifts after etching, indicating an etching-induced size reduction of the Si-NCs. It is shown that both the SF(6) plasma power and the flow rate can be utilized to control the etch rate (and thus the size reduction) of the Si-NCs. The SF(6) etched Si-NCs show only low concentrations of residual impurities other than fluorine. Quantum yields as high as 50% have been observed from these SF(6) etched Si-NCs despite oxidation.

  17. Etching method for photoresists or polymers

    NASA Technical Reports Server (NTRS)

    Lerner, Narcinda R. (Inventor); Wydeven, Theodore J., Jr. (Inventor)

    1991-01-01

    A method for etching or removing polymers, photoresists, and organic contaminants from a substrate is disclosed. The method includes creating a more reactive gas species by producing a plasma discharge in a reactive gas such as oxygen and contacting the resulting gas species with a sacrificial solid organic material such as polyethylene or polyvinyl fluoride, reproducing a highly reactive gas species, which in turn etches the starting polymer, organic contaminant, or photoresist. The sample to be etched is located away from the plasma glow discharge region so as to avoid damaging the substrate by exposure to high energy particles and electric fields encountered in that region. Greatly increased etching rates are obtained. This method is highly effective for etching polymers such as polyimides and photoresists that are otherwise difficult or slow to etch downstream from an electric discharge in a reactive gas.

  18. Calibrating etch model with SEM contours

    NASA Astrophysics Data System (ADS)

    Weisbuch, François; Omran, A.; Jantzen, Kenneth

    2015-03-01

    To ensure a high patterning quality, the etch effects have to be corrected within the OPC recipe in addition to the traditional lithographic effects. This requires the calibration of an accurate etch model and optimization of its implementation in the OPC flow. Using SEM contours is a promising approach to get numerous and highly reliable measurements especially for 2D structures for etch model calibration. A 28nm active layer was selected to calibrate and verify an etch model with 50 structures in total. We optimized the selection of the calibration structures as well as the model density. The implementation of the etch model to adjust the litho target layer allows a significant reduction of weak points. We also demonstrate that the etch model incorporated to the ORC recipe and run on large design can predict many hotspots.

  19. Controlled ion implant damage profile for etching

    DOEpatents

    Arnold, Jr., George W.; Ashby, Carol I. H.; Brannon, Paul J.

    1990-01-01

    A process for etching a material such as LiNbO.sub.3 by implanting ions having a plurality of different kinetic energies in an area to be etched, and then contacting the ion implanted area with an etchant. The various energies of the ions are selected to produce implant damage substantially uniformly throughout the entire depth of the zone to be etched, thus tailoring the vertical profile of the damaged zone.

  20. Selective etching of silicon carbide films

    DOEpatents

    Gao, Di; Howe, Roger T.; Maboudian, Roya

    2006-12-19

    A method of etching silicon carbide using a nonmetallic mask layer. The method includes providing a silicon carbide substrate; forming a non-metallic mask layer by applying a layer of material on the substrate; patterning the mask layer to expose underlying areas of the substrate; and etching the underlying areas of the substrate with a plasma at a first rate, while etching the mask layer at a rate lower than the first rate.

  1. Dynamics of self-assembled droplet etching

    NASA Astrophysics Data System (ADS)

    Heyn, Ch.; Stemmann, A.; Hansen, W.

    2009-10-01

    We study the self-assembled local droplet etching of nanoholes in AlGaAs surfaces with Ga droplets. The data establish an unexpected delay of both the hole drilling process as well as the removal of the liquid material after etching. Furthermore, coarsening by Ostwald ripening is found to reduce the droplet density before drilling. Basing on these findings, we propose a growth, coarsening, drilling, and removal mechanism for the droplet etching process.

  2. Etching radical controlled gas chopped deep reactive ion etching

    DOEpatents

    Olynick, Deidre; Rangelow, Ivo; Chao, Weilun

    2013-10-01

    A method for silicon micromachining techniques based on high aspect ratio reactive ion etching with gas chopping has been developed capable of producing essentially scallop-free, smooth, sidewall surfaces. The method uses precisely controlled, alternated (or chopped) gas flow of the etching and deposition gas precursors to produce a controllable sidewall passivation capable of high anisotropy. The dynamic control of sidewall passivation is achieved by carefully controlling fluorine radical presence with moderator gasses, such as CH.sub.4 and controlling the passivation rate and stoichiometry using a CF.sub.2 source. In this manner, sidewall polymer deposition thicknesses are very well controlled, reducing sidewall ripples to very small levels. By combining inductively coupled plasmas with controlled fluorocarbon chemistry, good control of vertical structures with very low sidewall roughness may be produced. Results show silicon features with an aspect ratio of 20:1 for 10 nm features with applicability to nano-applications in the sub-50 nm regime. By comparison, previous traditional gas chopping techniques have produced rippled or scalloped sidewalls in a range of 50 to 100 nm roughness.

  3. High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication

    NASA Astrophysics Data System (ADS)

    Pandhumsoporn, Tam; Wang, Lei; Feldbaum, Michael; Gadgil, Prashant; Puech, Michel; Maquin, Philippe

    1998-07-01

    MEMS fabrication faces multiple technological challenges before it can become a commercially viable technology. One key fabrication process required is the deep silicon etching for forming high aspect ratio structures. There is an increasing interest in the use of dry plasma etching for this application because of its anisotropic (i.e. independent of silicon crystal orientation) etching behavior, high etch rate, and its compatibility with traditional IC processing. Alcatel has developed a patented inductively coupled high density plasma source which delivers high etch rate, uniform, anisotropic silicon etching to depths as deep as 500 micrometers . This plasma source has been used for fabricating devices such as accelerometers, yaw rate sensors etc. Etch process performance data on some of these devices will be presented. Thus the Alcatel deep etching system provides the enabling technology requires for deep silicon micromachining of microsensors.

  4. Etching.

    DTIC Science & Technology

    1980-09-01

    4U c Z . CC 0.0 V 0-01w.0 OCMCC.Ca 0 II 4- 00 La-1 e - .- 0 04’ . £0 tO4 -u 41 ’ Dato C 5-4-00LLi1 c-1 C- - E-1 4-C0 V) -OU1 I~ rC ŔE 0 *z 0 LW 04 c...Z&.. 4.-c o x *C L )P0 A0 0 a54. U * 0 3 i;- L )I.. l C C -44.0 0 2 o; c 0. ama a- .u OE Voz 0 UL 0f ja - .a r DC L _j4 5c .,R r- C *.-* 0 - )W- . 0

  5. Method for dry etching of transition metals

    DOEpatents

    Ashby, C.I.H.; Baca, A.G.; Esherick, P.; Parmeter, J.E.; Rieger, D.J.; Shul, R.J.

    1998-09-29

    A method for dry etching of transition metals is disclosed. The method for dry etching of a transition metal (or a transition metal alloy such as a silicide) on a substrate comprises providing at least one nitrogen- or phosphorus-containing {pi}-acceptor ligand in proximity to the transition metal, and etching the transition metal to form a volatile transition metal/{pi}-acceptor ligand complex. The dry etching may be performed in a plasma etching system such as a reactive ion etching (RIE) system, a downstream plasma etching system (i.e. a plasma afterglow), a chemically-assisted ion beam etching (CAIBE) system or the like. The dry etching may also be performed by generating the {pi}-acceptor ligands directly from a ligand source gas (e.g. nitrosyl ligands generated from nitric oxide), or from contact with energized particles such as photons, electrons, ions, atoms, or molecules. In some preferred embodiments of the present invention, an intermediary reactant species such as carbonyl or a halide ligand is used for an initial chemical reaction with the transition metal, with the intermediary reactant species being replaced at least in part by the {pi}-acceptor ligand for forming the volatile transition metal/{pi}-acceptor ligand complex.

  6. Advanced plasma etch technologies for nanopatterning

    NASA Astrophysics Data System (ADS)

    Wise, Rich

    2012-03-01

    Advances in patterning techniques have enabled the extension of immersion lithography from 65/45nm through 14/10nm device technologies. A key to this increase in patterning capability has been innovation in the subsequent dry plasma etch processing steps. Multiple exposure techniques such as litho-etch-litho-etch, sidewall image transfer, line/cut mask and self-aligned structures have been implemented to solution required device scaling. Advances in dry plasma etch process control, across wafer uniformity and etch selectivity to both masking materials and have enabled adoption of vertical devices and thin film scaling for increased device performance at a given pitch. Plasma etch processes such as trilayer etches, aggressive CD shrink techniques, and the extension of resist trim processes have increased the attainable device dimensions at a given imaging capability. Precise control of the plasma etch parameters affecting across design variation, defectivity, profile stability within wafer, within lot, and across tools have been successfully implemented to provide manufacturable patterning technology solutions. IBM has addressed these patterning challenges through an integrated Total Patterning Solutions team to provide seamless and synergistic patterning processes to device and integration internal customers. This paper will discuss these challenges and the innovative plasma etch solutions pioneered by IBM and our alliance partners.

  7. Advanced plasma etch technologies for nanopatterning

    NASA Astrophysics Data System (ADS)

    Wise, Rich

    2013-10-01

    Advances in patterning techniques have enabled the extension of immersion lithography from 65/45 nm through 14/10 nm device technologies. A key to this increase in patterning capability has been innovation in the subsequent dry plasma etch processing steps. Multiple exposure techniques, such as litho-etch-litho-etch, sidewall image transfer, line/cut mask, and self-aligned structures, have been implemented to solution required device scaling. Advances in dry plasma etch process control across wafer uniformity and etch selectivity to both masking materials have enabled adoption of vertical devices and thin film scaling for increased device performance at a given pitch. Plasma etch processes, such as trilayer etches, aggressive critical dimension shrink techniques, and the extension of resist trim processes, have increased the attainable device dimensions at a given imaging capability. Precise control of the plasma etch parameters affecting across-design variation, defectivity, profile stability within wafer, within lot, and across tools has been successfully implemented to provide manufacturable patterning technology solutions. IBM has addressed these patterning challenges through an integrated total patterning solutions team to provide seamless and synergistic patterning processes to device and integration internal customers. We will discuss these challenges and the innovative plasma etch solutions pioneered by IBM and our alliance partners.

  8. Method for dry etching of transition metals

    DOEpatents

    Ashby, Carol I. H.; Baca, Albert G.; Esherick, Peter; Parmeter, John E.; Rieger, Dennis J.; Shul, Randy J.

    1998-01-01

    A method for dry etching of transition metals. The method for dry etching of a transition metal (or a transition metal alloy such as a silicide) on a substrate comprises providing at least one nitrogen- or phosphorous-containing .pi.-acceptor ligand in proximity to the transition metal, and etching the transition metal to form a volatile transition metal/.pi.-acceptor ligand complex. The dry etching may be performed in a plasma etching system such as a reactive ion etching (RIE) system, a downstream plasma etching system (i.e. a plasma afterglow), a chemically-assisted ion beam etching (CAIBE) system or the like. The dry etching may also be performed by generating the .pi.-acceptor ligands directly from a ligand source gas (e.g. nitrosyl ligands generated from nitric oxide), or from contact with energized particles such as photons, electrons, ions, atoms, or molecules. In some preferred embodiments of the present invention, an intermediary reactant species such as carbonyl or a halide ligand is used for an initial chemical reaction with the transition metal, with the intermediary reactant species being replaced at least in part by the .pi.-acceptor ligand for forming the volatile transition metal/.pi.-acceptor ligand complex.

  9. Dry etching technologies for reflective multilayer

    NASA Astrophysics Data System (ADS)

    Iino, Yoshinori; Karyu, Makoto; Ita, Hirotsugu; Kase, Yoshihisa; Yoshimori, Tomoaki; Muto, Makoto; Nonaka, Mikio; Iwami, Munenori

    2012-11-01

    We have developed a highly integrated methodology for patterning Extreme Ultraviolet (EUV) mask, which has been highlighted for the lithography technique at the 14nm half-pitch generation and beyond. The EUV mask is characterized as a reflective-type mask which is completely different compared with conventional transparent-type of photo mask. And it requires not only patterning of absorber layer without damaging the underlying multi reflective layers (40 Si/Mo layers) but also etching multi reflective layers. In this case, the dry etch process has generally faced technical challenges such as the difficulties in CD control, etch damage to quartz substrate and low selectivity to the mask resist. Shibaura Mechatronics ARESTM mask etch system and its optimized etch process has already achieved the maximal etch performance at patterning two-layered absorber. And in this study, our process technologies of multi reflective layers will be evaluated by means of optimal combination of process gases and our optimized plasma produced by certain source power and bias power. When our ARES™ is used for multilayer etching, the user can choose to etch the absorber layer at the same time or etch only the multilayer.

  10. Surface modification of Ti dental implants by Nd:YVO 4 laser irradiation

    NASA Astrophysics Data System (ADS)

    Braga, Francisco J. C.; Marques, Rodrigo F. C.; Filho, Edson de A.; Guastaldi, Antonio C.

    2007-09-01

    Surface modifications have been applied in endosteal bone devices in order to improve the osseointegration through direct contact between neoformed bone and the implant without an intervening soft tissue layer. Surface characteristics of titanium implants have been modified by addictive methods, such as metallic titanium, titanium oxide and hydroxyapatite powder plasma spray, as well as by subtractive methods, such as acid etching, acid etching associated with sandblasting by either AlO 2 or TiO 2, and recently by laser ablation. Surface modification for dental and medical implants can be obtained by using laser irradiation technique where its parameters like repetition rate, pulse energy, scanning speed and fluency must be taken into accounting to the appropriate surface topography. Surfaces of commercially pure Ti (cpTi) were modified by laser Nd:YVO 4 in nine different parameters configurations, all under normal atmosphere. The samples were characterized by SEM and XRD refined by Rietveld method. The crystalline phases αTi, βTi, Ti 6O, Ti 3O and TiO were formed by the melting and fast cooling processes during irradiation. The resulting phases on the irradiated surface were correlated with the laser beam parameters. The aim of the present work was to control titanium oxides formations in order to improve implants osseointegration by using a laser irradiation technique which is of great importance to biomaterial devices due to being a clean and reproducible process.

  11. Self-etch and etch-and-rinse adhesive systems in clinical dentistry.

    PubMed

    Ozer, Fusun; Blatz, Markus B

    2013-01-01

    Current adhesive systems follow either an "etch-and-rinse" or "self-etch" approach, which differ in how they interact with natural tooth structures. Etch-and-rinse systems comprise phosphoric acid to pretreat the dental hard tissues before rinsing and subsequent application of an adhesive. Self-etch adhesives contain acidic monomers, which etch and prime the tooth simultaneously. Etch-and-rinse adhesives are offered as two- or three-step systems, depending on whether primer and bonding are separate or combined in a single bottle. Similarly, self-etch adhesives are available as one- or two-step systems. Both etch-and-rinse and self-etch systems form a hybrid layer as a result of resins impregnating the porous enamel or dentin. Despite current trends toward fewer and simpler clinical application steps, one-step dentin bonding systems exhibit bonding agent lower bond strengths and seem less predictable than multi-step etch-and-rinse and self-etch systems. The varying evidence available today suggests that the choice between etch-and-rinse and self-etch systems is often a matter of personal preference. In general, however, phosphoric acid creates a more pronounced and retentive etching pattern in enamel. Therefore, etch-and-rinse bonding systems are often preferred for indirect restorations and when large areas of enamel are still present. Conversely, self-etch adhesives provide superior and more predictable bond strength to dentin and are, consequently, recommended for direct composite resin restorations, especially when predominantly supported by dentin.

  12. Shear bond strength of orthodontic brackets bonded to deciduous teeth with different etching times.

    PubMed

    Abu Alhaija, E S J; Irshaid, S M; Alwahadni, A M S

    2012-09-01

    This was to compare shear bond strength (SBS) of brackets bonded to deciduous teeth with that of permanent teeth, to evaluate the effect of increasing etching time on the SBS of brackets bonded to deciduous teeth and to evaluate the modes of bond failure after de-bonding. ex vivo study. A total of 120 freshly extracted human maxillary teeth were divided into six groups of 20 teeth each as follows: Group 1, permanent canines with 15-second etching time; Group 2, first premolars with 15-second etching time; Group 3, deciduous canines with 15-second etching time; Group 4, deciduous first molars with 15-second etching time; Group 5, deciduous canines with 30-second etching time; Group 6, deciduous first molars with 30-second etching time. After bonding, all specimens were thermocycled from 5 °C to 55 °C and back to 5 °C 500 times. The modified ARI was used to determine the mode of bond failure. Comparison between groups was performed using Univariate General Linear Model (UGLM) and chi-squared tests. SBS for permanent and deciduous teeth etched for 15 seconds averaged 106.60 ± 34.69 N and 96.90 ± 28.51 N, respectively. SBS for deciduous teeth etched for 15 seconds (91.90 ± 32.90 N and 101.80 ± 23.12 N for canines and molars respectively) and 30 seconds (110.40 ± 30.11 N and 94.20 ± 25.74 N for canines and molars, respectively). No significant differences were recorded between the different groups. Bond failure at the enamel-adhesive interface occurred more frequently in the deciduous teeth groups, while failure at bracket-adhesive interface occurred more frequently in the permanent teeth group. SBS of brackets bonded to deciduous teeth was comparable to that of permanent teeth.

  13. Mechanism of CW Nd:YAG laser recanalization with modified fiber tips: influence of temperature and axial force on tissue penetration in vitro.

    PubMed

    Verdaasdonk, R M; Jansen, E D; Holstege, F C; Borst, C

    1991-01-01

    Modified fiber tips are used for laser angioplasty of totally occluded peripheral arteries. It has not been established, however, to what extent the mechanism of action of various laser probes is optical, thermal, or mechanical. We examined transparant contact probes (hemispherical contact probes and ball-shaped fibers) and metal laser probes, coupled to a continuous-wave Nd-YAG laser. By using homogeneous thick porcine fatty tissue samples submerged in blood plasma, tissue penetration was measured in relation to the temperature of the probe and the axial force exerted on the tissue. By using 15 W, 1 s laser pulses, the surface of transparent contact probes had to be first contaminated by carbonized tissue particles to achieve tissue penetration. Penetration increased from 1 to 10 mm per pulse when axial force increased from 20 to 100 g. Metal probes had to be sufficiently insulated from the liquid environment by water vapour entrapped in a denatured protein layer to exceed the threshold temperature of 225 degrees C for tissue penetration. When axial force increased from 20 to 80 g at 10 W continuous exposure, the velocity of tissue penetration increased in the range from 1 to 4 mm/s. Tissue penetration by modified fiber tips is attributed to both remodeling and vaporization of tissue. With transparent contact probes, tissue is heated partly by direct light absorption and partly by a hot probe surface. Axially directed force is necessary to displace lateral non-ablated tissue and to overcome mechanical resistance. We conclude that mechanical dilation due to axial catherization force (Dotter effect) contributes substantially to tissue penetration by transparent contact probes.

  14. Hybrid Laser Processing of Transparent Materials

    NASA Astrophysics Data System (ADS)

    Niino, Hiroyuki

    The following chapter is an overview of processing fused silica and other transparent materials by pulsed-laser irradiation: (1) Direct excitation of materials with multi-wavelength excitation processes, and (2) Media-assisted process with a conventional pulsed laser. A method to etch transparent materials by using laserinduced plasma-assisted ablation (LIPAA), or laser-induced backside wet etching (LIBWE), has been described in detail.

  15. Modified surface morphology in surface ablation of cobalt-cemented tungsten carbide with pulsed UV laser radiation

    NASA Astrophysics Data System (ADS)

    Li, Tiejun; Lou, Qihong; Dong, Jingxing; Wei, Yunrong; Liu, Jingru

    2001-03-01

    Surface ablation of cobalt-cemented tungsten carbide hardmetal has been carried out in this work using a 308 nm, 20 ns XeCl excimer laser. The influence of ablation rate, surface roughness, surface micromorphology as well as surface phase structure on laser conditions including laser irradiance and pulse number have been investigated. The experimental results showed that the ablation rate and surface roughness were controlled by varying the number of pulses and laser irradiance. The microstructure and crystalline structure of irradiated surface layer varied greatly with different laser conditions. After 300 shots of laser irradiation at irradiance of 125 MW/cm 2, the surface micromorphology characterizing a uniform framework pattern of "hill-valleys". With the increment of laser shots at laser irradiance of 125 MW/cm 2, the microstructure of cemented tungsten carbide transformed from original polygon grains with the size of 3 μm to interlaced large and long grains after 300 shots of laser irradiation, and finally to gross grains with the size of 10 μm with clear grain boundaries after 700 shots. The crystalline structure of irradiated area has partly transformed from original WC to β-WC 1- x, then to α-W 2C and CW 3, and finally to W crystal. At proper laser irradiance and pulse number, cobalt binder has been selectively removed from the surface layer of hardmetal. It has been demonstrated that surface ablation with pulsed UV laser should be a feasible way to selectively remove cobalt binder from surface layer of cemented tungsten carbide hardmetal.

  16. Aggressiveness of contemporary self-etching adhesives. Part II: etching effects on unground enamel.

    PubMed

    Pashley, D H; Tay, F R

    2001-09-01

    The aggressiveness of three self-etching adhesives on unground enamel was investigated. Ultrastructural features and microtensile bond strength were examined, first using these adhesives as both the etching and resin-infiltration components, and then examining their etching efficacy alone through substitution of the proprietary resins with the same control resins. For SEM examination, buccal, mid-coronal, unground enamel from human extracted bicuspids were etched with either Clearfil Mega Bond (Kuraray), Non-Rinse Conditioner (NRC; Dentsply DeTrey) or Prompt L-Pop (ESPE). Those in the control group were etched with 32% phosphoric acid (Bisco) for 15s. They were all rinsed off prior to examination of the etching efficacy. For TEM examination, the self-etching adhesives were used as recommended. Unground enamel treated with NRC were further bonded using Prime&Bond NT (Dentsply), while those in the etched, control group were bonded using All-Bond 2 (Bisco). Completely demineralized, resin replicas were embedded in epoxy resin for examination of the extent of resin infiltration. For microtensile bond strength evaluation, specimens were first etched and bonded using the self-etching adhesives. A second group of specimens were etched with the self-etching adhesives, rinsed but bonded using a control adhesive. Following restoration with Z100 (3M Dental Products), they were sectioned into beams of uniform cross-sectional areas and stressed to failure. Etching patterns of aprismatic enamel, as revealed by SEM, and the subsurface hybrid layer morphology, as revealed by TEM, varied according to the aggressiveness of the self-etching adhesives. Clearfil Mega Bond exhibited the mildest etching patterns, while Prompt L-Pop produced an etching effect that approached that of the total-etch control group. Microtensile bond strength of the three experimental groups were all significantly lower than the control group, but not different from one another. When the self-etching

  17. [Lasers].

    PubMed

    Passeron, T

    2012-11-01

    Lasers are a very effective approach for treating many hyperpigmented lesions. They are the gold standard treatment for actinic lentigos and dermal hypermelanocytosis, such as Ota nevus. Becker nevus, hyperpigmented mosaicisms, and lentigines can also be successfully treated with lasers, but they could be less effective and relapses can be observed. However, lasers cannot be proposed for all types of hyperpigmentation. Thus, freckles and café-au-lait macules should not be treated as the relapses are nearly constant. Due to its complex pathophysiology, melasma has a special place in hyperpigmented dermatoses. Q-switched lasers (using standard parameters or low fluency) should not be used because of consistent relapses and the high risk of post-inflammatory hyperpigmentation. Paradoxically, targeting the vascular component of the melasma lesion with lasers could have a beneficial effect. However, these results have yet to be confirmed. In all cases, a precise diagnosis of the type of hyperpigmentation is mandatory before any laser treatment, and the limits and the potential side effects of the treatment must be clearly explained to patients.

  18. Lasers.

    PubMed

    Passeron, T

    2012-12-01

    Lasers are a very effective approach for treating many hyperpigmented lesions. They are the gold standard treatment for actinic lentigos and dermal hypermelanocytosis, such as Ota nevus. Becker nevus, hyperpigmented mosaicisms, and lentigines can also be successfully treated with lasers, but they could be less effective and relapses can be observed. However, lasers cannot be proposed for all types of hyperpigmentation. Thus, freckles and café-au-lait macules should not be treated as the relapses are nearly constant. Due to its complex pathophysiology, melasma has a special place in hyperpigmented dermatoses. Q-switched lasers (using standard parameters or low fluency) should not be used because of consistent relapses and the high risk of post-inflammatory hyperpigmentation. Paradoxically, targeting the vascular component of the melasma lesion with lasers could have a beneficial effect. However, these results have yet to be confirmed. In all cases, a precise diagnosis of the type of hyperpigmentation is mandatory before any laser treatment, and the limits and the potential side effects of the treatment must be clearly explained to patients.

  19. Modifying single-crystalline silicon by femtosecond laser pulses: an analysis by micro Raman spectroscopy, scanning laser microscopy and atomic force microscopy

    NASA Astrophysics Data System (ADS)

    Bonse, J.; Brzezinka, K.-W.; Meixner, A. J.

    2004-01-01

    The surface modification of single-crystalline silicon induced by single 130 femtosecond (fs) Ti:sapphire laser pulses (wavelength 800 nm) in air is investigated by means of micro Raman spectroscopy (μ-RS), atomic force microscopy and scanning laser microscopy. Depending on the laser fluence, in some regions the studies indicate a thin amorphous top-layer as well as ablated and recrystallized zones. The single-pulse threshold fluences for melting, ablation and polycrystalline recrystallization are determined quantitatively. Several different topographical surface structures (rims and protrusions) are found. Their formation is discussed in the context of recent studies of the laser irradiation of silicon. In combination with a thin-film optical model, the thickness of the amorphous layer is determined by two independent and nondestructive optical methods to be in the order of several 10 nm.

  20. Effect of etching time and light source on the bond strength of metallic brackets to ceramic.

    PubMed

    Gonçalves, Paulo Roberto Amaral; Moraes, Rafael Ratto de; Costa, Ana Rosa; Correr, Américo Bortolazzo; Nouer, Paulo Roberto Aranha; Sinhoreti, Mário Alexandre Coelho; Correr-Sobrinho, Lourenço

    2011-01-01

    This study evaluated the bond strength of brackets to ceramic testing different etching times and light sources for photo-activation of the bonding agent. Cylinders of feldspathic ceramic were etched with 10% hydrofluoric acid for 20 or 60 s. After application of silane on the ceramic surface, metallic brackets were bonded to the cylinders using Transbond XT (3M Unitek). The specimens for each etching time were assigned to 4 groups (n=15), according to the light source: XL2500 halogen light, UltraLume 5 LED, AccuCure 3000 argon laser, and Apollo 95E plasma arc. Light-activation was carried out with total exposure times of 40, 40, 20 and 12 s, respectively. Shear strength testing was carried out after 24 h. The adhesive remnant index (ARI) was evaluated under magnification. Data were subjected to two-way ANOVA and Tukey's test (α=0.05). Specimens etched for 20 s presented significantly lower bond strength (p<0.05) compared with those etched for 60 s. No significant differences (p>0.05) were detected among the light sources. The ARI showed a predominance of scores 0 in all groups, with an increase in scores 1, 2 and 3 for the 60 s time. In conclusion, only the etching time had significant influence on the bond strength of brackets to ceramic.

  1. SAXS study on the morphology of etched and un-etched ion tracks in apatite

    NASA Astrophysics Data System (ADS)

    Nadzri, A.; Schauries, D.; Afra, B.; Rodriguez, M. D.; Mota-Santiago, P.; Muradoglu, S.; Hawley, A.; Kluth, P.

    2015-04-01

    Natural apatite samples were irradiated with 185 MeV Au and 2.3 GeV Bi ions to simulate fission tracks. The resulting track morphology was investigated using synchrotron small angle x-ray scattering (SAXS) measurements before and after chemical etching. We present preliminary results from the SAXS measurement showing the etching process is highly anisotropic yielding faceted etch pits with a 6-fold symmetry. The measurements are a first step in gaining new insights into the correlation between etched and unetched fission tracks and the use of SAXS as a tool for studying etched tracks.

  2. Simulation of Etching Profiles Using Level Sets

    NASA Technical Reports Server (NTRS)

    Hwang, Helen; Govindan, T. R.; Meyyappan, M.; Arnold, James O. (Technical Monitor)

    1998-01-01

    Using plasma discharges to etch trenches and via holes in substrates is an important process in semiconductor manufacturing. Ion enhanced etching involves both neutral fluxes, which are isotropic, and ion fluxes, which are anisotropic. The angular distributions for the ions determines the degree of vertical etch, while the amount of the neutral fluxes determines the etch rate. We have developed a 2D profile evolution simulation which uses level set methods to model the plasma-substrate interface. Using level sets instead of traditional string models avoids the use of complicated delooping algorithms. The simulation calculates the etch rate based on the fluxes and distribution functions of both ions and neutrals. We will present etching profiles of Si substrates in low pressure (10s mTorr) Ar/Cl2 discharges for a variety of incident ion angular distributions. Both ion and neutral re-emission fluxes are included in the calculation of the etch rate, and their contributions to the total etch profile will be demonstrated. In addition, we will show RIE lag effects as a function of different trench aspect ratios. (For sample profiles, please see http://www.ipt.arc.nasa.gov/hwangfig1.html)

  3. Pyruvic acid as an etching agent.

    PubMed

    Retief, D H; Bischoff, J; van der Merwe, E H

    1976-07-01

    Phosphoric acid at different concentrations has been extensively used as an etching agent to improve bonding of dental materials to enamel surfaces. Recently attention has been drawn to the possible use of polyfunctional organic acids as conditioning agents. The object of this investigation was to determine the optimal concentration of pyruvic acid as an etching agent. A commercial composite resin with an intermediary bonding system supplied with 37% H3PO4 as an etching agent was used as the control system. In addition, a comparative study was carried out to evaluate 37% H3PO4, 20% lactic acid and the optimal concentration of pyruvic acid as conditioning solutions. Etching enamel surfaces with 10% pyruvic acid resulted in the optimal tensile bond strength of the resin to etched enamel surfaces. The use of 10% pyruvic acid did not adversely affect the bond strength of the resin system when compared to enamel surfaces etched with 37% H3PO4 for the same time period. Significantly lower tensile bond strengths were recorded on enamel surfaces etched with 20% lactic acid. The rate and depth of etching obtained with 37% H3PO4 can be considerably reduced by using 10% pyruvic acid as the conditioning agent.

  4. Simulation of Etching Profiles Using Level Sets

    NASA Technical Reports Server (NTRS)

    Hwang, Helen; Govindan, T. R.; Meyyappan, M.; Arnold, James O. (Technical Monitor)

    1998-01-01

    Using plasma discharges to etch trenches and via holes in substrates is an important process in semiconductor manufacturing. Ion enhanced etching involves both neutral fluxes, which are isotropic, and ion fluxes, which are anisotropic. The angular distributions for the ions determines the degree of vertical etch, while the amount of the neutral fluxes determines the etch rate. We have developed a 2D profile evolution simulation which uses level set methods to model the plasma-substrate interface. Using level sets instead of traditional string models avoids the use of complicated delooping algorithms. The simulation calculates the etch rate based on the fluxes and distribution functions of both ions and neutrals. We will present etching profiles of Si substrates in low pressure (10s mTorr) Ar/Cl2 discharges for a variety of incident ion angular distributions. Both ion and neutral re-emission fluxes are included in the calculation of the etch rate, and their contributions to the total etch profile will be demonstrated. In addition, we will show RIE lag effects as a function of different trench aspect ratios. (For sample profiles, please see http://www.ipt.arc.nasa.gov/hwangfig1.html)

  5. Note: Electrochemical etching of sharp iridium tips

    NASA Astrophysics Data System (ADS)

    Lalanne, Jean-Benoît; Paul, William; Oliver, David; Grütter, Peter H.

    2011-11-01

    We describe an etching procedure for the production of sharp iridium tips with apex radii of 15-70 nm, as determined by scanning electron microscopy, field ion microscopy, and field emission measurements. A coarse electrochemical etch followed by zone electropolishing is performed in a relatively harmless calcium chloride solution with high success rate.

  6. Influence of Etching Mode on Enamel Bond Durability of Universal Adhesive Systems.

    PubMed

    Suzuki, T; Takamizawa, T; Barkmeier, W W; Tsujimoto, A; Endo, H; Erickson, R L; Latta, M A; Miyazaki, M

    2016-01-01

    The purpose of this study was to determine the enamel bond durability of three universal adhesives in different etching modes through fatigue testing. The three universal adhesives used were Scotchbond Universal, Prime&Bond Elect universal dental adhesive, and All-Bond Universal light-cured dental adhesive. A single-step self-etch adhesive, Clearfil S(3) Bond Plus was used as a control. The shear bond strength (SBS) and shear fatigue strength (SFS) to human enamel were evaluated in total-etch mode and self-etch mode. A stainless steel metal ring with an internal diameter of 2.4 mm was used to bond the resin composite to the flat-ground (4000-grit) tooth surfaces for determination of both SBS and SFS. For each enamel surface treatment, 15 specimens were prepared for SBS and 30 specimens for SFS. The staircase method for fatigue testing was then used to determine the SFS of the resin composite bonded to the enamel using 10-Hz frequencies for 50,000 cycles or until failure occurred. Scanning electron microscopy was used to observe representative debonded specimen surfaces and the resin-enamel interfaces. A two-way analysis of variance and the Tukey post hoc test were used for analysis of the SBS data, whereas a modified t-test with Bonferroni correction was used for the SFS data. All adhesives in total-etch mode showed significantly higher SBS and SFS values than those in self-etch mode. Although All-Bond Universal in self-etch mode showed a significantly lower SBS value than the other adhesives, there was no significant difference in SFS values among the adhesives in this mode. All adhesives showed higher SFS:SBS ratios in total-etch mode than in self-etch mode. With regard to the adhesive systems used in this study, universal adhesives showed higher enamel bond strengths in total-etch mode. Although the influence of different etching modes on the enamel-bonding performance of universal adhesives was found to be dependent on the adhesive material, total-etch mode

  7. Mesoporosity in doped silicon nanowires from metal assisted chemical etching monitored by phonon scattering

    NASA Astrophysics Data System (ADS)

    McSweeney, William; Glynn, Colm; Geaney, Hugh; Collins, Gillian; Holmes, Justin D.; O'Dwyer, Colm

    2016-01-01

    Si nanowires (NWs) are shown to develop internal mesoporosity during metal assisted chemical etching from Si wafers. The onset of internal porosity in n+-Si(100) compared to p-Si(100) is examined through a systematic investigation of etching parameters (etching time, AgNO3 concentration, HF % and temperature). Electron microscopy and Raman scattering show that specific etching conditions reduce the size of the internal Si nanocrystallites in the internal mesoporous structure to 3-5 nm. Mesoporous NWs are found to have diameters as large as 500 nm, compared to ˜100 nm for p-NWs that develop surface roughness. Etching of Si (100) wafers results in (100)-oriented NWs forming a three-fold symmetrical surface texture, without internal NW mesoporosity. The vertical etching rate is shown to depend on carrier concentration and degree of internal mesoporosity formation. Raman scattering of the transverse optical phonon and photoluminescence measurements confirm quantum size effects, phonon scattering and visible intense red light emission between 685 and 720 nm in internally mesoporous NWs associated with the etching conditions. Laser power heating of NWs confirms phonon confinement and scattering, which is demonstrated to be a function of the internal mesoporosity development. We also demonstrate the limitation of mesoporosity formation in n+-Si NWs and development of porosity within p-Si NWs by controlling the etching conditions. Lastly, the data confirm that phonon confinement and scattering often reported for Si NWs is due to surface-bound and internal nanostructure, rather than simply a diameter reduction in NW materials.

  8. Applications of total-etch adhesive bonding.

    PubMed

    Strassler, Howard E

    2003-06-01

    The concept of total-etch adhesion for enamel and dentin is well accepted. Although new techniques with self-etching adhesives have been introduced, there needs to be more reported clinical trials before making a complete switch to these systems. Currently, the only adhesive systems with long-term data to support confidence and success with their clinical use are total-etch systems. Applications for using a total-etch adhesive bonding technique include sealants, orthodontic brackets, anterior composite resins, posterior composite resins, bonded dental silver amalgam, resin cementation with posts, all-metal, porcelain-metal, composite resin, and ceramic restorations, splinting, core foundations, and conservative treatment of the worn dentition. This article will review the concepts for clinical success with total-etch adhesion for a wide range of clinical applications.

  9. Mechanisms of Hydrocarbon Based Polymer Etch

    NASA Astrophysics Data System (ADS)

    Lane, Barton; Ventzek, Peter; Matsukuma, Masaaki; Suzuki, Ayuta; Koshiishi, Akira

    2015-09-01

    Dry etch of hydrocarbon based polymers is important for semiconductor device manufacturing. The etch mechanisms for oxygen rich plasma etch of hydrocarbon based polymers has been studied but the mechanism for lean chemistries has received little attention. We report on an experimental and analytic study of the mechanism for etching of a hydrocarbon based polymer using an Ar/O2 chemistry in a single frequency 13.56 MHz test bed. The experimental study employs an analysis of transients from sequential oxidation and Ar sputtering steps using OES and surface analytics to constrain conceptual models for the etch mechanism. The conceptual model is consistent with observations from MD studies and surface analysis performed by Vegh et al. and Oehrlein et al. and other similar studies. Parameters of the model are fit using published data and the experimentally observed time scales.

  10. Study on laser welding of fuel clad tubes and end plugs made of modified 9Cr-1Mo steel for metallic fuel of Fast Breeder Reactors

    NASA Astrophysics Data System (ADS)

    Harinath, Y. V.; Gopal, K. A.; Murugan, S.; Albert, S. K.

    2013-04-01

    A procedure for Pulsed Laser Beam Welding (PLBW) has been developed for fabrication of fuel pins made of modified 9Cr-1Mo steel for metallic fuel proposed to be used in future in India's Fast Breeder Reactor (FBR) programme. Initial welding trials of the samples were carried out with different average power using Nd-YAG based PLBW process. After analyzing the welds, average power for the weld was optimized for the required depth of penetration and weld quality. Subsequently, keeping the average power constant, the effect of various other welding parameters like laser peak power, pulse frequency, pulse duration and energy per pulse on weld joint integrity were studied and a procedure that would ensure welds of acceptable quality with required depth of penetration, minimum size of fusion zone and Heat Affected Zone (HAZ) were finalized. This procedure is also found to reduce the volume fraction delta-ferrite in the fusion zone.

  11. Nanoscale etching and flattening of metals with ozone water.

    PubMed

    Hatsuki, Ryuji; Yamamoto, Takatoki

    2012-06-13

    Etchants used for metal etching are generally harmful to the environment. We propose an environmentally friendly method that uses ozone water to etch metals. We measured the dependencies of ozone water etching on the temperature and ozone concentration for several metals and evaluated the surface roughness of the etched surfaces. The etching rate was proportional to the dissolved ozone concentration, and the temperature and the surfaces were smoothed by etching.

  12. Laser labeling, a safe technology to label produce

    USDA-ARS?s Scientific Manuscript database

    Labeling of the produce has gained marked attention in recent years. Laser labeling technology involves the etching of required information on the surface using a low energy CO2 laser beam. The etching forms alphanumerical characters by pinhole dot matrix depressions. These openings can lead to wat...

  13. Etch-a-Sketch Nanoelectronics

    NASA Astrophysics Data System (ADS)

    Levy, Jeremy

    2009-10-01

    The popular children's toy Etch-a-Sketch has motivated the invention of a new material capable of writing and erasing wires so small they approach the spacing between atoms. The interface between two normally insulating materials, strontium titanate and lanthanum aluminate, can be switched between the insulating and conducting state with the use of the sharp metallic probe of an atomic-force microscope. By ``sketching'' this probe in various patterns, one can create electronic materials with remarkably diverse properties. This material system shows promise both for ultra-high density storage and as possible replacements for silicon-based logic (CMOS). This work is supported by the National Science Foundation, Defense Advanced Research Projects Agency, Army Research Office and Air Force Office of Scientific Research.

  14. Enhanced electrochemical etching of ion irradiated silicon by localized amorphization

    SciTech Connect

    Dang, Z. Y.; Breese, M. B. H.; Lin, Y.; Tok, E. S.; Vittone, E.

    2014-05-12

    A tailored distribution of ion induced defects in p-type silicon allows subsequent electrochemical anodization to be modified in various ways. Here we describe how a low level of lattice amorphization induced by ion irradiation influences anodization. First, it superposes a chemical etching effect, which is observable at high fluences as a reduced height of a micromachined component. Second, at lower fluences, it greatly enhances electrochemical anodization by allowing a hole diffusion current to flow to the exposed surface. We present an anodization model, which explains all observed effects produced by light ions such as helium and heavy ions such as cesium over a wide range of fluences and irradiation geometries.

  15. Modification of Structure and Strength Properties of Permanent Joints Under Laser Beam Welding with Application of Nanopowder Modifiers

    NASA Astrophysics Data System (ADS)

    Cherepanov, A. N.; Orishich, A. M.; Malikov, A. G.; Ovcharenko, V. E.

    2016-08-01

    In the paper we present the results of experimental study of specially prepared nanosize metal-ceramic compositions impact upon structure, microhardness and mechanical properties of permanent joints produced by laser-beam welding of steel and titanium alloy plates.

  16. Silver ion mediated shape control of platinum nanoparticles: Removal of silver by selective etching leads to increased catalytic activity

    SciTech Connect

    Grass, Michael E.; Yue, Yao; Habas, Susan E.; Rioux, Robert M.; Teall, Chelsea I.; Somorjai, G.A.

    2008-01-09

    A procedure has been developed for the selective etching of Ag from Pt nanoparticles of well-defined shape, resulting in the formation of elementally-pure Pt cubes, cuboctahedra, or octahedra, with a largest vertex-to-vertex distance of {approx}9.5 nm from Ag-modified Pt nanoparticles. A nitric acid etching process was applied Pt nanoparticles supported on mesoporous silica, as well as nanoparticles dispersed in aqueous solution. The characterization of the silica-supported particles by XRD, TEM, and N{sub 2} adsorption measurements demonstrated that the structure of the nanoparticles and the mesoporous support remained conserved during etching in concentrated nitric acid. Both elemental analysis and ethylene hydrogenation indicated etching of Ag is only effective when [HNO{sub 3}] {ge} 7 M; below this concentration, the removal of Ag is only {approx}10%. Ethylene hydrogenation activity increased by four orders of magnitude after the etching of Pt octahedra that contained the highest fraction of silver. High-resolution transmission electron microscopy of the unsupported particles after etching demonstrated that etching does not alter the surface structure of the Pt nanoparticles. High [HNO{sub 3}] led to the decomposition of the capping agent, polyvinylpyrollidone (PVP); infrared spectroscopy confirmed that many decomposition products were present on the surface during etching, including carbon monoxide.

  17. Matrix-assisted laser desorption ionization time-of-flight mass spectrometry: a powerful tool for the mass and sequence analysis of natural and modified oligonucleotides.

    PubMed Central

    Pieles, U; Zürcher, W; Schär, M; Moser, H E

    1993-01-01

    We report the analysis and characterization of natural and modified oligonucleotides by matrix-assisted laser desorption ionization time-of-flight mass spectrometry (MALDI-TOF MS). The present technology was highly improved for this class of compounds by using a new matrix, 2,4,6-trihydroxy acetophenone, together with di- and triammonium salts of organic or inorganic acids to suppress peak broadening due to multiple ion adducts. This methodology can be used in combination with time dependent degradation of oligonucleotides by exonucleases as powerful tool to determine sequence compositions. PMID:8341593

  18. Study of microstructure and silicon segregation in cast iron using color etching and electron microprobe analysis

    SciTech Connect

    Vazehrad, S.; Diószegi, A.

    2015-06-15

    An investigation on silicon segregation of lamellar, compacted and nodular graphite iron was carried out by applying a selective, immersion color etching and a modified electron microprobe to study the microstructure. The color etched micrographs of the investigated cast irons by revealing the austenite phase have provided data about the chronology and mechanism of microstructure formation. Moreover, electron microprobe has provided two dimensional segregation maps of silicon. A good agreement was found between the segregation profile of silicon in the color etched microstructure and the silicon maps achieved by electron microprobe analysis. However, quantitative silicon investigation was found to be more accurate than color etching results to study the size of the eutectic colonies. - Highlights: • Sensitivity of a color etchant to silicon segregation is quantitatively demonstrated. • Si segregation measurement by EMPA approved the results achieved by color etching. • Color etched micrographs provided data about solidification mechanism in cast irons. • Austenite grain boundaries were identified by measuring the local Si concentration.

  19. Modifying Driving Laser Wavelength to Generate Coherent, Ultrafast X-rays from Phase-Matched High-Order Harmonics

    NASA Astrophysics Data System (ADS)

    Chen, Ming-Chang

    Recently, ultrafast, coherent X-ray science and technology has received a lot of attentions, especially with respect to tabletop X-rays produced by high harmonic generation (HHG). The femtosecond-to-attosecond X-ray pulse enables the dynamics of chemical reactions, nano-materials and bio-molecular systems to be studied with unprecedented temporal and spatial resolution. However, the bright HHG light source is limited to < 150 eV spectral region due to phase-mismatch issue and the lack of the right driving laser wavelength. Development of phase-matching scheme and different-wavelength lasers for extending bright HHG to shorter wavelengths becomes a challenge. Over the past five years, we essentially solve the high-harmonic phase matching problem using longer driving wavelengths. Our experimental results have shown that full phase matching of HHG scales very strongly with wavelength of the driving laser, making it possible for the first time to obtain bright phase-matched emission to the 0.5 keV using a 2 mum laser and the keV using a 3.9 mum laser with a conversion efficiency >1000 times that previously reported. Their supercontinuum bandwidths are capable of generation extremely short pulses down to single digit attoseconds ( 10--18 sec). This timescale is remarkable in that it approaches a new regime where light transit times approach atomic dimensions. On the other hand, by using a shorter wavelength of driving laser (0.4 um), we also optimized the HHG flux ˜ 10 times brighter than before in the EUV spectral region between 45 and 60 eV. We found that the most substantial HHG enhancement arises when the right combination of the laser wavelengths, gas species and gas pressures. A high flux tabletop coherent X-ray beam line is feasible to implement, for applications in biological and materials imaging, or as a seeding source for a free-electron laser amplifier.

  20. High density plasma etching of magnetic devices

    NASA Astrophysics Data System (ADS)

    Jung, Kee Bum

    Magnetic materials such as NiFe (permalloy) or NiFeCo are widely used in the data storage industry. Techniques for submicron patterning are required to develop next generation magnetic devices. The relative chemical inertness of most magnetic materials means they are hard to etch using conventional RIE (Reactive Ion Etching). Therefore ion milling has generally been used across the industry, but this has limitations for magnetic structures with submicron dimensions. In this dissertation, we suggest high density plasmas such as ECR (Electron Cyclotron Resonance) and ICP (Inductively Coupled Plasma) for the etching of magnetic materials (NiFe, NiFeCo, CoFeB, CoSm, CoZr) and other related materials (TaN, CrSi, FeMn), which are employed for magnetic devices like magnetoresistive random access memories (MRAM), magnetic read/write heads, magnetic sensors and microactuators. This research examined the fundamental etch mechanisms occurring in high density plasma processing of magnetic materials by measuring etch rate, surface morphology and surface stoichiometry. However, one concern with using Cl2-based plasma chemistry is the effect of residual chlorine or chlorinated etch residues remaining on the sidewalls of etched features, leading to a degradation of the magnetic properties. To avoid this problem, we employed two different processing methods. The first one is applying several different cleaning procedures, including de-ionized water rinsing or in-situ exposure to H2, O2 or SF6 plasmas. Very stable magnetic properties were achieved over a period of ˜6 months except O2 plasma treated structures, with no evidence of corrosion, provided chlorinated etch residues were removed by post-etch cleaning. The second method is using non-corrosive gas chemistries such as CO/NH3 or CO2/NH3. There is a small chemical contribution to the etch mechanism (i.e. formation of metal carbonyls) as determined by a comparison with Ar and N2 physical sputtering. The discharge should be NH3

  1. Longitudinal Effect of Surface Treatments Modified by NaOCl-Induced Deproteinization and Nd:YAG Laser on Dentin Permeability.

    PubMed

    Esteves, Stella Renata Machado Silva; Huhtala, Maria Filomena Rocha Lima; Gomes, Ana Paula Martins; Ye, Qiang; Spencer, Paulette; De Paiva Gonçalves, Sérgio Eduardo

    2016-02-01

    The purpose of this study was to evaluate dentin permeability after dentin hypersensitivity treatments: fluoride, adhesive system, and collagen deproteinization with and without Nd:YAG laser exposure, and after erosive and abrasive challenges. Dentin permeability was assessed by measuring dentinal fluid flow using a permeability device. Eighty bovine dentin specimens (6 mm diameter/1 mm thickness) had permeability measured in the presence of the smear layer and after removal of the smear layer by ethylenediaminetetraacetic acid (EDTA). They were then divided into eight groups according to treatment (n = 10): Group C, control; Group L, Nd:YAG laser; Group F, fluoride; Group FL, fluoride plus Nd:YAG laser; Group A, adhesive; Group AL, adhesive plus Nd:YAG laser; Group D, 10% NaOCl plus adhesive; and group DL, NaOCl plus adhesive plus Nd:YAG laser. Nd:YAG laser was irradiated at 60 mJ/pulse/10 Hz/47.7 J/cm2/1 W and applied freehanded without contact for 60 sec. Permeability was measured 24 h after the treatments. The specimens were exposed to erosive and abrasive challenges for 5 days. Erosive challenge was done by immersion in Coca-Cola, four times a day/90 sec each. After the first and last erosive challenge of the day, the abrasive challenge was conducted by brushing the specimens (24,000 cycles/3.8 cm range/200 g weight), and permeability was measured again. Results were analyzed statistically using two factor ANOVA and Tukey tests (α = 0.05). With the exception of groups FL and A, all treatments reduced permeability. A significant reduction in permeability was seen when the treatments were combined with laser exposure. The association of adhesive and Nd:YAG laser led to the lowest rate of permeability after 24 h. NaOCl-induced deproteinization associated with Nd:YAG laser showed the lowest permeability rate after erosive/abrasive challenges. Dentin hypersensitivity treatments reduced dentin permeability when associated with Nd

  2. The effect of inductively-coupled-plasma reactive ion etching power on the etching rate and the surface roughness of a sapphire substrate.

    PubMed

    Chang, Chun-Ming; Shiao, Ming-Hua; Yang, Chin-Tien; Cheng, Chung-Ta; Hsueh, Wen-Jeng

    2014-10-01

    In this study, patterned sapphire substrates are fabricated using nanosphere lithography (NSL) and inductively-coupled-plasma reactive ion etching (ICP-RIE). Polystyrene nanospheres of approximately 600 nm diameter are self-assembled on c-plane sapphire substrates by spin-coating. The diameter of the polystyrene nanospheres is modified to adjust the etching mask pitch cycle using oxygen plasma in the ICP-RIE system. A nickel thin film mask of 100 nm thickness is deposited by electron-beam evaporation on a substrate covered with treated nanospheres. The sapphire substrate is then etched in an inductively coupled plasma system using BCl3/Ar gas, to fabricate a structure with a periodic sub-micron hole array with different sidewall intervals. The DC bias voltage, the sapphire etching rate, the surface roughness, are studied as a function of the ICP and the RF power. Different sub-micron hole arrays with spacing cycles of 89 nm, 139 nm and 167 nm are successfully fabricated on the sapphire substrate, using suitable etching parameters.

  3. Plasma chemical modification of track-etched membrane surface layer for improvement of their biomedical properties

    NASA Astrophysics Data System (ADS)

    Kravets, Liubov I.; Ryazantseva, Tatyana V.

    2013-12-01

    The morphological and clinical studies of poly(ethylene terephthalate) track-etched membrane modified by plasma of non-polymerizing gases as drainage materials for antiglaucomatous operations were performed. It was demonstrated their compatibility with eye tissues. Moreover, it was shown that a new drainage has a good lasting hypotensive effect and can be used as operation for refractory glaucoma surgery.

  4. R2O3 (R = La, Y) modified erbium activated germanate glasses for mid-infrared 2.7 μm laser materials

    NASA Astrophysics Data System (ADS)

    Cai, Muzhi; Zhou, Beier; Wang, Fengchao; Wei, Tao; Tian, Ying; Zhou, Jiajia; Xu, Shiqing; Zhang, Junjie

    2015-08-01

    Er3+ activated germanate glasses modified by La2O3 and Y2O3 with good thermal stability were prepared. 2.7 μm fluorescence was observed and corresponding radiative properties were investigated. A detailed discussion of J-O parameters has been carried out based on absorption spectra and Judd-Ofelt theory. The peak emission cross sections of La2O3 and Y2O3 modified germanate glass are (14.3 ± 0.10) × 10-21 cm2 and (15.4 ± 0.10) × 10-21 cm2, respectively. Non-radiative relaxation rate constants and energy transfer coefficients of 4I11/2 and 4I13/2 levels have been obtained and discussed to understand the 2.7 μm fluorescence behavior. Moreover, the energy transfer processes of 4I11/2 and 4I13/2 level were quantitatively analyzed according to Dexter’s theory and Inokuti-Hirayama model. The theoretical calculations are in good agreement with the observed 2.7 μm fluorescence phenomena. Results demonstrate that the Y2O3 modified germanate glass, which possesses more excellent spectroscopic properties than La2O3 modified germanate glass, might be an attractive candidate for mid-infrared laser.

  5. Atmospheric pressure matrix-assisted laser desorption/ionization mass spectrometry of friction modifier additives analyzed directly from base oil solutions.

    PubMed

    Widder, Lukas; Brennerb, Josef; Huttera, Herbert

    2014-01-01

    To develop new products and to apply measures of quality control quick and simple accessibility of additive composition in automo- tive lubrication is important. The aim of this study was to investigate the possibility of analyzing organic friction modifier additives by means of atmospheric pressure matrix-assisted laser desorption/ionization mass spectrometry [AP-MALDI-MS] from lubricant solu- tions without the use of additional separation techniques. Analyses of selected friction modifier ethoxylated tallow amines and oleic acid amide were compared using two ionization methods, positive-ion electrospray ionization (ESI) and AP-MALDI, using a LTQ Orbitrap mass spectrometer. Pure additives were characterized from solvent solutions, as well as from synthetic and mineral base oil mixtures. Detected ions of pure additive samples consisted mainly of [M + H]+, but also alkaLi metal adducts [M + Na]+ and [M + K]+ could be seen. Characterizations of blends of both friction modifiers from the base oil mixtures were carried out as well and showed significant inten- sities for several additive peaks. Thus, this work shows a method to directly analyze friction modifier additives used in the automotive industry from an oil blend via the use of AP-MALDI without any further separation steps. The method presented will further simplify the acquisition of data on lubricant composition and additives. Furthermore, it allows the perspective of analyzing additive reaction products directly from formulated oil blends.

  6. R2O3 (R = La, Y) modified erbium activated germanate glasses for mid-infrared 2.7 μm laser materials

    PubMed Central

    Cai, Muzhi; Zhou, Beier; Wang, Fengchao; Wei, Tao; Tian, Ying; Zhou, Jiajia; Xu, Shiqing; Zhang, Junjie

    2015-01-01

    Er3+ activated germanate glasses modified by La2O3 and Y2O3 with good thermal stability were prepared. 2.7 μm fluorescence was observed and corresponding radiative properties were investigated. A detailed discussion of J–O parameters has been carried out based on absorption spectra and Judd–Ofelt theory. The peak emission cross sections of La2O3 and Y2O3 modified germanate glass are (14.3 ± 0.10) × 10−21 cm2 and (15.4 ± 0.10) × 10−21 cm2, respectively. Non-radiative relaxation rate constants and energy transfer coefficients of 4I11/2 and 4I13/2 levels have been obtained and discussed to understand the 2.7 μm fluorescence behavior. Moreover, the energy transfer processes of 4I11/2 and 4I13/2 level were quantitatively analyzed according to Dexter’s theory and Inokuti–Hirayama model. The theoretical calculations are in good agreement with the observed 2.7 μm fluorescence phenomena. Results demonstrate that the Y2O3 modified germanate glass, which possesses more excellent spectroscopic properties than La2O3 modified germanate glass, might be an attractive candidate for mid-infrared laser. PMID:26279092

  7. Etch Characteristics of GaN using Inductively Coupled Cl2 Plasma Etching

    NASA Astrophysics Data System (ADS)

    Rosli, Siti Azlina; Aziz, A. Abdul

    2008-05-01

    In this study, the plasma characteristics and GaN etch properties of inductively coupled Cl2/Ar plasmas were investigated. It has shown that the results of a study of inductively coupled plasma (ICP) etching of gallium nitride by using Cl2/Ar is possible to meet the requirement (anisotropy, high etch rate and high selectivity), simultaneously. We have investigated the etching rate dependency on the percentage of Argon in the gas mixture, the total pressure and DC voltage. We found that using a gas mixture with 20 sccm of Ar, the optimum etch rate of GaN was achieved. The etch rate were found to increase with voltage, attaining a maximum rate 2500 Å/min at -557 V. The addition of an inert gas, Ar is found to barely affect the etch rate. Surface morphology of the etched samples was verified by scanning electron microscopy and atomic force microscopy. It was found that the etched surface was anisotropic and the smoothness of the etched surface is comparable to that of polished wafer.

  8. Etching-limiting process and origin of loading effects in silicon etching with hydrogen chloride gas

    NASA Astrophysics Data System (ADS)

    Morioka, Naoya; Suda, Jun; Kimoto, Tsunenobu

    2014-01-01

    The etching-limiting step in slow Si etching with HCl/H2 at atmospheric pressure was investigated. The etching was performed at a low etching rate below 10 nm/min in the temperature range of 1000-1100 °C. In the case of bare Si etching, it was confirmed that the etching rate showed little temperature dependence and was proportional to the equilibrium pressure of the etching by-product SiCl2 calculated by thermochemical analysis. In addition, the etching rates of Si(100) and (110) faces were almost the same. These results indicate that SiCl2 diffusion in the gas phase is the rate-limiting step. In the etching of the Si surface with SiO2 mask patterns, a strong loading effect (mask/opening pattern dependence of the etching rate) was observed. The simulation of the diffusion of gas species immediately above the Si surface revealed that the loading effect was attributed to the pattern-dependent diffusion of SiCl2.

  9. Dissolution studies of bovine dental enamel surfaces modified by high-speed scanning ablation with a lambda = 9.3-microm TEA CO(2) laser.

    PubMed

    Fried, Daniel; Featherstone, John D B; Le, Charles Q; Fan, Kenneth

    2006-10-01

    Previous studies have demonstrated that lasers can be used to modify the chemical composition of dental enamel to render the mineral phase more resistant to acid dissolution with minimal peripheral thermal damage. Transverse excited atmospheric (TEA) CO(2) lasers tuned to the strong mineral absorption of hydroxyapatite (HAP) near lambda = 9 microm are well-suited for the efficient ablation of dental hard tissues if the laser-pulse is stretched to greater than 5-10 microseconds to avoid plasma shielding phenomena. Moreover, TEA CO(2) lasers can be operated at very high repetition rates and are inherently less expensive and more versatile than Er:YAG and Er:YSGG solid-state lasers. In this study a lambda = 9.3-microm TEA CO(2) with a pulse duration of 8 microseconds and a repetition rate of 300 Hz was used to uniformly treat bovine enamel surfaces at ablative irradiation intensities. We hypothesized that a uniform surface layer of modified enamel of improved crystallinity and CaP phase composition would be formed with an enhanced resistance to acid-dissolution in the ablated areas at higher scanning rates used with the water spray. Such a modified layer of enamel formed at the base and walls of a cavity preparation under the irradiation conditions employed in this study have the potential to inhibit secondary caries under sealants and restorations. The surfaces of bovine enamel blocks (3 x 3 mm(2)) were rapidly scanned across the laser beam at rates of 2, 3, and 6 mm/second with and without a water-spray at an incident fluence of 30 J/cm(2). The resistance to acid dissolution was evaluated using controlled surface dissolution experiments on laser-irradiated and control samples. The groups irradiated at a fluence of 30 J/cm(2) with a repetition rate of 300 Hz and a high scan rate of 6 mm/second with and without water-cooling significantly reduced the overall surface dissolution rates (P < 0.001). At low scan rates (2-3 mm/second) excessive heat deposition resulted in

  10. Enzymatic degradation of adhesive-dentin interfaces produced by mild self-etch adhesives.

    PubMed

    De Munck, Jan; Mine, Atsushi; Van den Steen, Philippe E; Van Landuyt, Kirsten L; Poitevin, André; Opdenakker, Ghislain; Van Meerbeek, Bart

    2010-10-01

    Endogenous matrix metalloproteinases (MMPs) released by adhesive procedures may degrade collagen in the hybrid layer and so compromise the bonding effectiveness of etch-and-rinse adhesives. In this study, endogenous enzymatic degradation was evaluated for several simplified self-etch adhesives. In addition, primers were modified by adding two MMP inhibitors: chlorhexidine, a commonly used disinfectant, but also a non-specific MMP inhibitor; and SB-3CT, a specific inhibitor of MMP-2 and MMP-9. Gelatin zymography of fresh human dentin powder was used to identify the enzymes released by the adhesives. Micro-tensile bond strength (μTBS) testing was used to assess the mechanical properties of resin-dentin interfaces over time. In none of the experimental groups treated with the mild self-etch adhesives was MMP-2 and/or MMP-9 identified. Also, no difference in the μTBS was measured for the inhibitor-modified and the control inhibitor-free adhesives after 6 months of water storage. It is concluded that in contrast to etch-and-rinse adhesives, the involvement of endogenous MMP-2 and MMP-9 in the bond-degradation process is minimal for mild self-etch adhesives.

  11. Nanoparticle-based etching of silicon surfaces

    DOEpatents

    Branz, Howard [Boulder, CO; Duda, Anna [Denver, CO; Ginley, David S [Evergreen, CO; Yost, Vernon [Littleton, CO; Meier, Daniel [Atlanta, GA; Ward, James S [Golden, CO

    2011-12-13

    A method (300) of texturing silicon surfaces (116) such to reduce reflectivity of a silicon wafer (110) for use in solar cells. The method (300) includes filling (330, 340) a vessel (122) with a volume of an etching solution (124) so as to cover the silicon surface 116) of a wafer or substrate (112). The etching solution (124) is made up of a catalytic nanomaterial (140) and an oxidant-etchant solution (146). The catalytic nanomaterial (140) may include gold or silver nanoparticles or noble metal nanoparticles, each of which may be a colloidal solution. The oxidant-etchant solution (146) includes an etching agent (142), such as hydrofluoric acid, and an oxidizing agent (144), such as hydrogen peroxide. Etching (350) is performed for a period of time including agitating or stirring the etching solution (124). The etch time may be selected such that the etched silicon surface (116) has a reflectivity of less than about 15 percent such as 1 to 10 percent in a 350 to 1000 nanometer wavelength range.

  12. Galvanic etch stop for Si in KOH

    NASA Astrophysics Data System (ADS)

    Connolly, E. J.; French, P. J.; Xia, X. H.; Kelly, J. J.

    2004-08-01

    Etch stops and etch-stopping techniques are essential 'tools' for 2D and 3D MEMS devices. Until now, use of a galvanic etch stop (ES) for micromachining in alkaline solutions was usually prohibited due to the large Au:Si area needed and/or high oxygen content required to achieve the ES. We report a new galvanic ES which requires a Au:exposed silicon area ratio of only ~1. Thus for the first time a practical galvanic ES for KOH has been achieved. The ES works by adding small amounts of sodium hypochlorite, NaOCl, to KOH solutions. Essentially the NaOCl increases the oxygen content in the KOH etchant. The dependancy of the galvanic ES on KOH concentration and temperature is investigated. Also, we report on the effects of the added NaOCl on etch rates. SEM images are used to examine the galvanically etch-stopped membranes and their surface morphology. For 33% KOH solutions the galvanic etch stop worked well, producing membranes with uniform thickness ~6 µm (i.e. slightly greater than the deposited epilayer). For 20% KOH solutions, the galvanic etch stop still worked, but the resulting membranes were a little thicker (~10 µm).

  13. Improved Cryofixation Applicable to Freeze Etching

    PubMed Central

    Bachmann, L.; Schmitt, W. W.

    1971-01-01

    Freeze etching of solute model systems (e.g., glycerol or ferritin solutions) demonstrates that cryofixation can introduce serious artifacts due to the segregation of the dissolved or dispersed material from the solvent. Since, in principle, this problem can be reduced by increasing the cooling rate, a new technique has been developed which combines spray freezing with freeze etching. This spray-freeze-etching is applied by first spraying the specimen into a liquid cryomedium. The frozen droplets are then “glued” together with butylbenzene to form a regular freeze-etch specimen, while the temperature of the sample is kept at -85°C. The results obtained by spray-freeze-etching are far superior to those obtained by standard freezing. Our results, using 5% glycerol as a test specimen, are equivalent to those obtained by the high-pressure method (1). The reduction of segregation during freezing makes freeze etching a method applicable for the investigation of solute systems. Furthermore, the study of unicellular organisms or cellular fractions by freeze etching without the use of antifreeze is made possible. Images PMID:4943787

  14. Fe-catalyzed etching of graphene layers

    NASA Astrophysics Data System (ADS)

    Cheng, Guangjun; Calizo, Irene; Hight Walker, Angela; PML, NIST Team

    We investigate the Fe-catalyzed etching of graphene layers in forming gas. Fe thin films are deposited by sputtering onto mechanically exfoliated graphene, few-layer graphene (FLG), and graphite flakes on a Si/SiO2 substrate. When the sample is rapidly annealed in forming gas, particles are produced due to the dewetting of the Fe thin film and those particles catalyze the etching of graphene layers. Monolayer graphene and FLG regions are severely damaged and that the particles catalytically etch channels in graphite. No etching is observed on graphite for the Fe thin film annealed in nitrogen. The critical role of hydrogen indicates that this graphite etching process is catalyzed by Fe particles through the carbon hydrogenation reaction. By comparing with the etched monolayer and FLG observed for the Fe film annealed in nitrogen, our Raman spectroscopy measurements identify that, in forming gas, the catalytic etching of monolayer and FLG is through carbon hydrogenation. During this process, Fe particles are catalytically active in the dissociation of hydrogen into hydrogen atoms and in the production of hydrogenated amorphous carbon through hydrogen spillover.

  15. In vitro fibroblast and pre-osteoblastic cellular responses on laser surface modified Ti-6Al-4V.

    PubMed

    Chikarakara, Evans; Fitzpatrick, Patricia; Moore, Eric; Levingstone, Tanya; Grehan, Laura; Higginbotham, Clement; Vázquez, Mercedes; Bagga, Komal; Naher, Sumsun; Brabazon, Dermot

    2014-12-29

    The success of any implant, dental or orthopaedic, is driven by the interaction of implant material with the surrounding tissue. In this context, the nature of the implant surface plays a direct role in determining the long term stability as physico-chemical properties of the surface affect cellular attachment, expression of proteins, and finally osseointegration. Thus to enhance the degree of integration of the implant into the host tissue, various surface modification techniques are employed. In this work, laser surface melting of titanium alloy Ti-6Al-4V was carried out using a CO2 laser with an argon gas atmosphere. Investigations were carried out to study the influence of laser surface modification on the biocompatibility of Ti-6Al-4V alloy implant material. Surface roughness, microhardness, and phase development were recorded. Initial knowledge of these effects on biocompatibility was gained from examination of the response of fibroblast cell lines, which was followed by examination of the response of osteoblast cell lines which is relevant to the applications of this material in bone repair. Biocompatibility with these cell lines was analysed via Resazurin cell viability assay, DNA cell attachment assay, and alamarBlue metabolic activity assay. Laser treated surfaces were found to preferentially promote cell attachment, higher levels of proliferation, and enhanced bioactivity when compared to untreated control samples. These results demonstrate the tremendous potential of this laser surface melting treatment to significantly improve the biocompatibility of titanium implants in vivo.

  16. Variation of cell spreading on TiO2 film modified by 775 nm and 388 nm femtosecond laser irradiation

    NASA Astrophysics Data System (ADS)

    Tsukamoto, M.; Shinonaga, T.; Sato, Y.; Chen, P.; Nagai, A.; Hanawa, T.

    2014-03-01

    Titanium (Ti) is one of the most used biomaterials in metals. However, Ti is typically artificial materials. Thus, it is necessary for improving the biocompatibility of Ti. Recently, coating of the titanium dioxides (TiO2) film on Ti plate has been proposed to improve biocompatibility of Ti. We have developed coating method of the film on Ti plate with an aerosol beam. Periodic structures formation on biomaterials was also a useful method for improving the biocompatibility. Direction of cell spreading might be controlled along the grooves of periodic microstructures. In our previous study, periodic nanostructures were formed on the film by femtosecond laser irradiation at fundamental wave (775 nm). Period of the periodic nanostructures was about 230 nm. In cell test, cell spreading along the grooves of the periodic nanostructures was observed although it was not done for the film without the periodic nanostructures. Then, influence of the period of the periodic nanostructures on cell spreading has not been investigated yet. The period might be changed by changing the laser wavelength. In this study, the periodic nanostructures were created on the film with femtosecond laser at 775nm and 388 nm, respectively. After cell test, cell spreading along the grooves of the periodic nanostructures was observed on 775 nm and 388nm laser irradiated areas. Distribution of direction of cell spreading on laser irradiated area was also examined. These results suggested that controlling the cell spreading on periodic nanostructures with period of 230 nm was better than that with period of 130 nm.

  17. Dislocation etching of rough crystal faces

    NASA Astrophysics Data System (ADS)

    Van Enckevort, W. J. P.; Smet, F.

    1988-07-01

    A model for the preferential dissolution near the outcrops of dislocations at rough (K, S or F faces above the roughening temperature) crystal faces has been developed. In contrast to F faces below the roughening transition, no lateral flow of steps from the etched dislocation centre occurs and therefore only small etch pits, either not or only barely visible by optical microscopy are expected to be formed. This was confirmed by etching of K, S and F faces of Bi 4(GeO 4) 3, KH 2PO 4 and potash alum crystals.

  18. Electroless epitaxial etching for semiconductor applications

    DOEpatents

    McCarthy, Anthony M.

    2002-01-01

    A method for fabricating thin-film single-crystal silicon on insulator substrates using electroless etching for achieving efficient etch stopping on epitaxial silicon substrates. Microelectric circuits and devices are prepared on epitaxial silicon wafers in a standard fabrication facility. The wafers are bonded to a holding substrate. The silicon bulk is removed using electroless etching leaving the circuit contained within the epitaxial layer remaining on the holding substrate. A photolithographic operation is then performed to define streets and wire bond pad areas for electrical access to the circuit.

  19. Etching Semiconductors With Beams Of Reactive Atoms

    NASA Technical Reports Server (NTRS)

    Minton, Timothy K.; Giapis, Konstantinos P.; Moore, Teresa A.

    1995-01-01

    Method of etching semiconductors with energetic beams of electrically neutral, but chemically reactive, species undergoing development. Enables etching of straight walls into semiconductor substrates at edges of masks without damage to underlying semiconductor material. In addition to elimination of charge damage, technique reduces substrate bombardment damage because translational energy of neutral species in range 2-12 eV, below damage threshold of many semiconductor materials. Furthermore, low-energy neutrals cause no mask erosion allowing for etching features with very high aspect ratios.

  20. Method of sputter etching a surface

    DOEpatents

    Henager, C.H. Jr.

    1984-02-14

    The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion. 4 figs.

  1. Method of sputter etching a surface

    DOEpatents

    Henager, Jr., Charles H.

    1984-01-01

    The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.

  2. Effects of laser labeling on the quality of citrus fruit during storage

    USDA-ARS?s Scientific Manuscript database

    Etching the required information on fruit and vegetables is an alternative means to label produce. Low energy CO2 laser etches the surface showing the contrasting underlying layer. These etched surfaces can promote water loss and potentially allow for pathogen entry. Studies were conducted to measur...

  3. Effects of laser labeling on the quality of tangerines during storage

    USDA-ARS?s Scientific Manuscript database

    Etching the required information on fruit and vegetables is an alternative means to label produce. Low energy CO2 laser etches the surface showing the contrasting underlying layer. These etched surfaces can promote water loss and potentially allow for pathogen entry. Studies were conducted to measur...

  4. Laser labeling and its effect on the storage quality of citrus fruits

    USDA-ARS?s Scientific Manuscript database

    Etching the required information on the skins of fruits and vegetables is an alternative way to label produce. A low energy CO2 laser beam etches the outermost layer of the epidermis revealing the contrasting underneath layer while forming alphanumerical characters. These etched areas represent brea...

  5. Etch proximity correction through machine-learning-driven etch bias model

    NASA Astrophysics Data System (ADS)

    Shim, Seongbo; Shin, Youngsoo

    2016-03-01

    Accurate prediction of etch bias has become more important as technology node shrinks. A simulation is not feasible solution in full chip level due to excessive runtime, so etch proximity correction (EPC) often relies on empirically obtained rules or models. However, simple rules alone cannot accurately correct various pattern shapes, and a few empirical parameters in model-based EPC is still not enough to achieve satisfactory OCV. We propose a new approach of etch bias modeling through machine learning (ML) technique. A segment of interest (and its surroundings) are characterized by some geometric and optical parameters, which are received by an artificial neural network (ANN), which then outputs predicted etch bias of the segment. The ANN is used as our etch bias model for new EPC, which we propose in this paper. The new etch bias model and EPC are implemented in commercial OPC tool and demonstrated using 20nm technology DRAM gate layer.

  6. Carrier-lifetime-controlled selective etching process for semiconductors using photochemical etching

    DOEpatents

    Ashby, Carol I. H.; Myers, David R.

    1992-01-01

    The minority carrier lifetime is significantly much shorter in semiconductor materials with very high impurity concentrations than it is in semiconductor materials with lower impurity concentration levels. This phenomenon of reduced minority carrier lifetime in semiconductor materials having high impurity concentration is utilized to advantage for permitting highly selective semiconductor material etching to be achieved using a carrier-driven photochemical etching reaction. Various means may be employed for increasing the local impurity concentration level in specific near-surface regions of a semiconductor prior to subjecting the semiconductor material to a carrier-driven photochemical etching reaction. The regions having the localized increased impurity concentration form a self-aligned mask inhibiting photochemical etching at such localized regions while the adjacent regions not having increased impurity concentrations are selectively photochemically etched. Liquid- or gas-phase etching may be performed.

  7. Anisotropic etching of monocrystalline silicon under subcritical conditions

    NASA Astrophysics Data System (ADS)

    Gonzalez-Pereyra, Nestor Gabriel

    Sub- and supercritical fluids remain an underexploited resource for materials processing. Around its critical point a common compound such as water behaves like a different substance exhibiting changes in its properties that modify its behavior as a solvent and unlock reaction paths not viable in other conditions. In the subcritical region water's properties can be directed by controlling temperature and pressure. Water and silicon are two of the most abundant, versatile, environmentally non-harmful, and simplest substances on Earth. They are among the most researched and best-known substances. Both are ubiquitous and essential for present-day world. Silicon is fundamental in semiconductor fabrication, microelectromechanical systems, and photovoltaic cells. Wet etching of silicon is a fabrication strategy shared by these three applications. Processing of silicon requires large amounts of water, often involving dangerous and environmentally hazardous chemicals. Yet, minimal knowledge is available on the ways high temperature water interacts with crystalline silicon. The purpose of this project is to identify and implement a method for the modification of monocrystalline silicon surfaces with three important characteristics: 1) requires minimal amounts of added chemicals, 2) controllability of morphological features formed, 3) reduced processing time. This will be accomplished by subjecting crystalline silicon to diluted alkaline solutions working in the subcritical region of water. This approach allows for variations on surface morphologies and etching rates by adapting the reactions conditions, with focus on composition and temperature of the solutions used. The work reported discusses the techniques used for producing surfaces with a variety of morphologies that ultimately allowed to create patterns and textures on silicon wafers, using highly diluted alkaline solutions that can be used for photovoltaic applications. These morphologies were created with a

  8. Freeze fracture and freeze etching.

    PubMed

    Chandler, Douglas E; Sharp, William P

    2014-01-01

    Freeze fracture depends on the property of frozen tissues or cells, when cracked open, to split along the hydrophobic interior of membranes, thus revealing broad panoramas of membrane interior. These large panoramas reveal the three-dimensional contours of membranes making the methods well suited to studying changes in membrane architecture. Freshly split membrane faces are visualized by platinum or tungsten shadowing and carbon backing to form a replica that is then cleaned of tissue and imaged by TEM. Etching, i.e., removal of ice from the frozen fractured specimen by sublimation prior to shadowing, can also reveal the true surfaces of the membrane as well as the extracellular matrix and cytoskeletal networks that contact the membranes. Since the resolution of detail in the metal replicas formed is 1-2 nm, these methods can also be used to visualize macromolecules or macromolecular assemblies either in situ or displayed on a mica surface. These methods are available for either specimens that have been chemically fixed or specimens that have been rapidly frozen without chemical intervention.

  9. Metal assisted anodic etching of silicon

    NASA Astrophysics Data System (ADS)

    Lai, Chang Quan; Zheng, Wen; Choi, W. K.; Thompson, Carl V.

    2015-06-01

    Metal assisted anodic etching (MAAE) of Si in HF, without H2O2, is demonstrated. Si wafers were coated with Au films, and the Au films were patterned with an array of holes. A Pt mesh was used as the cathode while the anodic contact was made through either the patterned Au film or the back side of the Si wafer. Experiments were carried out on P-type, N-type, P+-type and N+-type Si wafers and a wide range of nanostructure morphologies were observed, including solid Si nanowires, porous Si nanowires, a porous Si layer without Si nanowires, and porous Si nanowires on a thick porous Si layer. Formation of wires was the result of selective etching at the Au-Si interface. It was found that when the anodic contact was made through P-type or P+-type Si, regular anodic etching due to electronic hole injection leads to formation of porous silicon simultaneously with metal assisted anodic etching. When the anodic contact was made through N-type or N+-type Si, generation of electronic holes through processes such as impact ionization and tunnelling-assisted surface generation were required for etching. In addition, it was found that metal assisted anodic etching of Si with the anodic contact made through the patterned Au film essentially reproduces the phenomenology of metal assisted chemical etching (MACE), in which holes are generated through metal assisted reduction of H2O2 rather than current flow. These results clarify the linked roles of electrical and chemical processes that occur during electrochemical etching of Si.Metal assisted anodic etching (MAAE) of Si in HF, without H2O2, is demonstrated. Si wafers were coated with Au films, and the Au films were patterned with an array of holes. A Pt mesh was used as the cathode while the anodic contact was made through either the patterned Au film or the back side of the Si wafer. Experiments were carried out on P-type, N-type, P+-type and N+-type Si wafers and a wide range of nanostructure morphologies were observed

  10. Black Germanium fabricated by reactive ion etching

    NASA Astrophysics Data System (ADS)

    Steglich, Martin; Käsebier, Thomas; Kley, Ernst-Bernhard; Tünnermann, Andreas

    2016-09-01

    A reactive ion etching technique for the preparation of statistical "Black Germanium" antireflection surfaces, relying on self-organization in a Cl2 etch chemistry, is presented. The morphology of the fabricated Black Germanium surfaces is the result of a random lateral distribution of pyramidal etch pits with heights around (1450 ± 150) nm and sidewall angles between 80° and 85°. The pyramids' base edges are oriented along the <110> crystal directions of Germanium, indicating a crystal anisotropy of the etching process. In the Vis-NIR, the tapered Black Germanium surface structure suppresses interface reflection to <2.5 % for normal incidence and still to <6 % at an angle of incidence of 70°. The presented Black Germanium might find applications as low-cost AR structure in optoelectronics and IR optics.

  11. Epoxy bond and stop etch fabrication method

    DOEpatents

    Simmons, Jerry A.; Weckwerth, Mark V.; Baca, Wes E.

    2000-01-01

    A class of epoxy bond and stop etch (EBASE) microelectronic fabrication techniques is disclosed. The essence of such techniques is to grow circuit components on top of a stop etch layer grown on a first substrate. The first substrate and a host substrate are then bonded together so that the circuit components are attached to the host substrate by the bonding agent. The first substrate is then removed, e.g., by a chemical or physical etching process to which the stop etch layer is resistant. EBASE fabrication methods allow access to regions of a device structure which are usually blocked by the presence of a substrate, and are of particular utility in the fabrication of ultrafast electronic and optoelectronic devices and circuits.

  12. Semiconductor structure and recess formation etch technique

    DOEpatents

    Lu, Bin; Sun, Min; Palacios, Tomas Apostol

    2017-02-14

    A semiconductor structure has a first layer that includes a first semiconductor material and a second layer that includes a second semiconductor material. The first semiconductor material is selectively etchable over the second semiconductor material using a first etching process. The first layer is disposed over the second layer. A recess is disposed at least in the first layer. Also described is a method of forming a semiconductor structure that includes a recess. The method includes etching a region in a first layer using a first etching process. The first layer includes a first semiconductor material. The first etching process stops at a second layer beneath the first layer. The second layer includes a second semiconductor material.

  13. Method for anisotropic etching in the manufacture of semiconductor devices

    DOEpatents

    Koontz, Steven L.; Cross, Jon B.

    1993-01-01

    Hydrocarbon polymer coatings used in microelectronic manufacturing processes are anisotropically etched by atomic oxygen beams (translational energies of 0.2-20 eV, preferably 1-10 eV). Etching with hyperthermal (kinetic energy>1 eV) oxygen atom species obtains highly anisotropic etching with sharp boundaries between etched and mask-protected areas.

  14. Method for anisotropic etching in the manufacture of semiconductor devices

    NASA Technical Reports Server (NTRS)

    Koontz, Steven L. (Inventor); Cross, Jon B. (Inventor)

    1993-01-01

    Hydrocarbon polymer coatings used in microelectronic manufacturing processes are anisotropically etched by hyperthermal atomic oxygen beams (translational energies of 0.2 to 20 eV, preferably 1 to 10 eV). Etching with hyperthermal oxygen atom species obtains highly anisotropic etching with sharp boundaries between etched and mask protected areas.

  15. Effect of hydrofluoric acid concentration and etching duration on select surface roughness parameters for zirconia.

    PubMed

    Smielak, Beata; Klimek, Leszek

    2015-06-01

    The surface of zirconia is resistant to chemical treatment. Roughening the surface of densely sintered zirconia still poses a challenge in dentistry. The purpose of the study was to examine the effects of hydrofluoric acid on the quality of surface roughening of zirconia. One hundred cylindrical disks made from zirconia (Ceramill Zi; Amann Girrbach AG) were divided into 4 groups. Three groups (n=30) were distinguished on the basis of hydrofluoric acid (HF) concentration: 40% HF, 9.5% HF, and 5% HF. The groups were then further divided into 3 groups of 10 specimens, each based on etch time (1, 5, or 15 minutes). The control group (n=10) consisted of specimens polished with SiC abrasive paper. The surface was examined with scanning electron microscopy, and the roughness was measured with a profilometer and confocal laser scanning microscope. The mean arithmetic profile deviation (Ra(mean)) and mean maximum height of profile (Rz(mean)) results for the etched surfaces in relationship to the baseline surfaces were compared with the Student t test for averaged data (α=.05). When etched with 40% HF concentration, the Ra(mean) and Rz(mean) results were statistically higher (P<.01) for the etched surfaces than for the baseline surfaces. When etched with 9.5% HF concentration, the higher Ra(mean) and Rz(mean) results were only statistically significant (P<.01) after 15 minutes. Etching with 5% HF concentration showed no significant differences (P>.05). Etching with a 5% HF solution should not be recommended as a method for roughening zirconia surfaces. Copyright © 2015 Editorial Council for the Journal of Prosthetic Dentistry. Published by Elsevier Inc. All rights reserved.

  16. Effect of phosphoric acid etching on the shear bond strength of two self-etch adhesives.

    PubMed

    Sabatini, Camila

    2013-01-01

    To evaluate the effect of optional phosphoric acid etching on the shear bond strength (SBS) of two self-etch adhesives to enamel and dentin. Ninety-six bovine mandibular incisors were ground flat to obtain enamel and dentin substrates. A two-step self-etch adhesive (FL-Bond II) and a one-step self-etch adhesive (BeautiBond) were applied with and without a preliminary acid etching to both the enamel and dentin. The specimens were equally and randomly assigned to 4 groups per substrate (n=12) as follows: FL-Bond II etched; FL-Bond II un-etched; BeautiBond etched; BeautiBond un-etched. Composite cylinders (Filtek Z100) were bonded onto the treated tooth structure. The shear bond strength was evaluated after 24 hours of storage (37°C, 100% humidity) with a testing machine (Ultra-tester) at a speed of 1 mm/min. The data was analyzed using a two-way ANOVA and post-hoc Tukey's test with a significance level of p<0.05. A field emission scanning electron microscope was used for the failure mode analysis. Both adhesives evidenced a significant decrease in the dentin SBS with the use of an optional phosphoric acid-etching step (p<0.05). Preliminary phosphoric acid etching yielded significantly higher enamel SBS for FL-Bond II (p<0.05) only, but not for BeautiBond. FL-Bond II applied to un-etched dentin demonstrated the highest mean bond strength (37.7±3.2 MPa) and BeautiBond applied to etched dentin showed the lowest mean bond strength (18.3±6.7 MPa) among all tested groups (p<0.05). The use of a preliminary acid-etching step with 37.5% phosphoric acid had a significant adverse effect on the dentin bond strength of the self-etch adhesives evaluated while providing improvement on the enamel bond strength only for FL-Bond II. This suggests that the potential benefit that may be derived from an additional etching step with phosphoric acid does not justify the risk of adversely affecting the bond strength to dentin.

  17. Etch pitting and subsurface pore growth during the thermal etching of silver

    NASA Astrophysics Data System (ADS)

    Ollivier, M.; Harker, R. M.; Gourlay, C. M.

    2015-11-01

    The thermal etching of silver was extensively studied in the middle of twentieth century, revealing the key role of oxygen on surface morphology changes including: grains striation, grain-boundary grooving and etch pitting. Here we probe the role of the subsurface and defects induced by rolling on the thermal etching of pure silver sheet. Nanometre- and micrometre-sized faceted pores have been observed in the subsurface region after heat treatments in air. The relationship between these subsurface pores and rolling defects is demonstrated. A mechanism for the formation of subsurface pores based on the precipitation/reaction of dissolved oxygen is suggested which can also explain the aligned etch pitting observed.

  18. Precise in situ etch depth control of multilayered III−V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

    PubMed Central

    Kleinschmidt, Ann-Kathrin; Barzen, Lars; Strassner, Johannes; Doering, Christoph; Bock, Wolfgang; Wahl, Michael; Kopnarski, Michael

    2016-01-01

    Reflectance anisotropy spectroscopy (RAS) equipment is applied to monitor dry-etch processes (here specifically reactive ion etching (RIE)) of monocrystalline multilayered III–V semiconductors in situ. The related accuracy of etch depth control is better than 16 nm. Comparison with results of secondary ion mass spectrometry (SIMS) reveals a deviation of only about 4 nm in optimal cases. To illustrate the applicability of the reported method in every day settings for the first time the highly etch depth sensitive lithographic process to form a film lens on the waveguide ridge of a broad area laser (BAL) is presented. This example elucidates the benefits of the method in semiconductor device fabrication and also suggests how to fulfill design requirements for the sample in order to make RAS control possible. PMID:28144528

  19. Plasma etching of ion-implanted polysilicon

    SciTech Connect

    Karulkar, P.C.; Wirzbicki, M.A.

    1989-09-01

    Ion implantation is increasingly used to dope polysilicon gates to obtain lower resistivities and also to control the cumulative time-temperature cycling of VLSI wafers. Dry etching of polysilicon doped with phosphorus by ion implantation was studied using a parallel-plate etcher and two different etch chemistries sulfur haxafluoride-O{sub 2}-argon and SF6-CCl2F2-Ar. These two etch procedures were previously found to result in excellent etching of polysilicon which was doped with phosphorus by solid-source diffusion. Large differences in the cross-sectional profiles of ion-implanted polysilicon were found while using the two chemistries. SF6-dichlorodifluoromethane-Ar chemistry caused sharp notch-like undercuts, while the SF6-O2-Ar chemistry exhibited linewidth loss without any notching. Examples of the cross sections of ion-implanted polysilicon are presented along with a discussion of the possible mechanisms that cause the different cross-sectional profiles in the two etch chemistries. The notching is explained in terms of the variation in the dopant concentration and in the structure of ion-implanted polysilicon at different depths. The absence of notching in the cross section of ion-implanted polysilicon etched in the SF6-O2-Ar chemistry is explained by proposing that the interaction of oxygen in the SF6-O2-Ar chemistry with the etched surface makes the chemistry less sensitive to the dopant concentration in the etched material. Results of a simple experiment which support the proposed explanation are presented.

  20. Metal assisted anodic etching of silicon.

    PubMed

    Lai, Chang Quan; Zheng, Wen; Choi, W K; Thompson, Carl V

    2015-07-07

    Metal assisted anodic etching (MAAE) of Si in HF, without H2O2, is demonstrated. Si wafers were coated with Au films, and the Au films were patterned with an array of holes. A Pt mesh was used as the cathode while the anodic contact was made through either the patterned Au film or the back side of the Si wafer. Experiments were carried out on P-type, N-type, P(+)-type and N(+)-type Si wafers and a wide range of nanostructure morphologies were observed, including solid Si nanowires, porous Si nanowires, a porous Si layer without Si nanowires, and porous Si nanowires on a thick porous Si layer. Formation of wires was the result of selective etching at the Au-Si interface. It was found that when the anodic contact was made through P-type or P(+)-type Si, regular anodic etching due to electronic hole injection leads to formation of porous silicon simultaneously with metal assisted anodic etching. When the anodic contact was made through N-type or N(+)-type Si, generation of electronic holes through processes such as impact ionization and tunnelling-assisted surface generation were required for etching. In addition, it was found that metal assisted anodic etching of Si with the anodic contact made through the patterned Au film essentially reproduces the phenomenology of metal assisted chemical etching (MACE), in which holes are generated through metal assisted reduction of H2O2 rather than current flow. These results clarify the linked roles of electrical and chemical processes that occur during electrochemical etching of Si.