USING ACID-RESISTANT PHOTOSENSITIVE EMULSIONS TO OBTAIN LOCAL INHOMOGENEITIES WITH A HIGH RESOLVING POWER ON MONOCRYSTALS AND FILMS OF GERMANIUM AND SILICON (PRIMENENIE KISLOTOSTOYKHIKH SVETOCHUVSTVITELNYKH EMULSII DLYA POLUCHENIYA LOKALNYKH NEODNORODNOSTEI S VYSOKIM RAZRESHENIEM NA MONOKRISTALLAKH I PLENKAKH GERMANIYA I KREMNIYA),

DTIC Science & Technology

It was found that the esters of polystyrene and cinnamic acid , polyvinyl alcohol, and cinnamic acid have high dielectric characteristics that change...Photosensitive acid -resisting emulsions for use in photoengraving of semiconductor parts and semiconductor surfaces were synthesized and tested...organosilicon compounds, cinnamic aldehyde, emulsions based on azo and diazo compounds and polymeric polyesters--were tested. The photoengraving method